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Sample records for contact uv nanoimprint

  1. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    DEFF Research Database (Denmark)

    Kehagias, N.; Reboud, V.; Chansin, G.

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer...... are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed...... polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three...

  2. Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

    International Nuclear Information System (INIS)

    Kehagias, N; Reboud, V; Chansin, G; Zelsmann, M; Jeppesen, C; Schuster, C; Kubenz, M; Reuther, F; Gruetzner, G; Torres, C M Sotomayor

    2007-01-01

    In this paper, we report results on a newly developed nanofabrication technique, namely reverse-contact UV nanoimprint lithography. This technique is a combination of nanoimprint lithography and contact printing lithography. In this process, a lift-off resist and a UV cross-linkable polymer are spin-coated successively onto a patterned UV mask-mould. These thin polymer films are then transferred from the mould to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the mould and the substrate, the unexposed polymer areas are dissolved in a developer solution leaving behind the negative features of the original stamp. This method delivers resist pattern transfer without a residual layer, thereby rending unnecessary the etching steps typically needed in the imprint lithography techniques for three-dimensional patterning. Three-dimensional woodpile-like structures were successfully fabricated with this new technique

  3. Submicron three-dimensional structures fabricated by reverse contact UV nanoimprint lithography

    DEFF Research Database (Denmark)

    Kehagias, N.; Reboud, Vincent; Chansin, G.

    2006-01-01

    The fabrication of a three-dimensional multilayered nanostructure is demonstrated with a newly developed nanofabrication technique, namely, reverse contact ultraviolet nanoimprint lithography. This technique is a combination of reverse nanoimprint lithography and contact ultraviolet lithography....... In this process, a UV cross-linkable polymer and a thermoplastic polymer are spin coated onto a patterned hybrid metal-quartz stamp. These thin polymer films are then transferred from the stamp to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light....... After separation of the stamp and the substrate, the unexposed polymer areas are rinsed away with acetone leaving behind the negative features of the original stamp with no residual layer....

  4. Double transfer UV-curing nanoimprint lithography

    International Nuclear Information System (INIS)

    Shen, Yiming; Yao, Lei; Li, Zhiwei; Kou, Junlong; Cui, Yushuang; Bian, Jie; Yuan, Changsheng; Ge, Haixiong; Chen, Yanfeng; Li, Wen-Di; Wu, Wei

    2013-01-01

    A challenge in the fabrication of nanostructures into non-planar substrates is to form a thin, uniform resist film on non-planar surfaces. This is critical to the fabrication of nanostructures via a lithographic technique due to the subsequent pattern transfer process. Here we report a new double transfer UV-curing nanoimprint technique that can create a nanopatterned thin film with a uniform residual layer not only on flat substrates but also on highly curved surfaces. Surface relief gratings with pitches down to 200 nm are successfully imprinted on the cylindrical surface of optical fibers, and further transferred into a SiO 2 matrix using reactive ion etching (RIE), demonstrating that our technique is applicable for fabricating high-resolution nanostructures on non-planar substrates. (paper)

  5. Weak interfaces for UV cure nanoimprint lithography

    Science.gov (United States)

    Houle, Frances; Fornof, Ann; Simonyi, Eva; Miller, Dolores; Truong, Hoa

    2008-03-01

    Nanoimprint lithography using a photocurable organic resist provides a means of patterning substrates with a spatial resolution in the few nm range. The usefulness of the technique is limited by defect generation during template removal, which involves fracture at the interface between the template and the newly cured polymer. Although it is critical to have the lowest possible interfacial fracture toughness (Gc less than 0.1 Jm-2) to avoid cohesive failure in the polymer, there is little understanding on how to achieve this using reacting low viscosity resist fluids. Studies of debonding of a series of free-radical cured polyhedral silsesquioxane crosslinker formulations containing selected reactive diluents from fluorosilane-coated quartz template materials will be described. At constant diluent fraction the storage modulus of cured resists follows trends in initial reaction rate, not diluent Tg. Adhesion is uncorrelated with both Tg and storage modulus. XPS studies of near-interface compositions indicate that component segregation within the resist fluid on contact with the template, prior to cure, plays a significant role in controlling the fracture process.

  6. High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography

    NARCIS (Netherlands)

    Büyükköse, S.; Vratzov, Boris; van der Wiel, Wilfred Gerard

    2011-01-01

    The authors present a novel global contact planarization technique based on the spin-on-glass material hydrogen silsequioxane (HSQ) and demonstrate its excellent performance on patterns of 70 nm up to several microns generated by UV-based nanoimprint lithography. The HSQ layer (∼165 nm) is spin

  7. Durable diamond-like carbon templates for UV nanoimprint lithography

    International Nuclear Information System (INIS)

    Tao, L; Ramachandran, S; Nelson, C T; Overzet, L J; Goeckner, M; Lee, G; Hu, W; Lin, M; Willson, C G; Wu, W

    2008-01-01

    The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40 nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography

  8. Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography

    Science.gov (United States)

    Tanabe, Akira; Uehara, Takuya; Nagase, Kazuro; Ikedo, Hiroaki; Hiroshiba, Nobuya; Nakamura, Takahiro; Nakagawa, Masaru

    2016-06-01

    We demonstrated a coating method of screen printing for discharging droplets of a high-viscosity resin on a substrate for ultraviolet (UV) nanoimprint lithography (NIL). Compared with a spin-coated resin film on a silicon substrate, discharged resin droplets on a silicon substrate were effective in terms of the uniformity of residual layer thickness (RLT) in contact with a mold with various pattern densities. Fluorescence microscope observations with a fluorescent-dye-containing UV-curable resin enabled the evaluation of the shapes of resin droplets discharged on a substrate surface. Widely used screen mesh plates composed of a stainless mesh covered with a patterned emulsion film caused defects of undischarged parts, whereas defects-free resin droplets with a narrow size distribution were discharged by mesh-free plates prepared with laser ablation. The pitch-to-diameter ratio in the configuration of 10-µm-diameter holes needs to be larger than 2.5 times for printing a resin having a viscosity of 12,800 mPa s.

  9. Replication of cicada wing's nano-patterns by hot embossing and UV nanoimprinting

    International Nuclear Information System (INIS)

    Hong, Sung-Hoon; Hwang, Jaeyeon; Lee, Heon

    2009-01-01

    The hydrophobicity of the cicada wing originates from its naturally occurring, surface nano-structure. The nano-structure of the cicada wing consists of an array of nano-sized pillars, 100 nm in diameter and 300 nm in height. In this study, the nano-structure of the cicada wing was successfully duplicated by using hot embossing lithography and UV nanoimprint lithography (NIL). The diameter and pitch of replication were the same as those of the original cicada wing and the height was a little smaller than that of the original master. The transmittance of the hot embossed PVC film was increased by 2-6% compared with that of the bare PVC film. The hydrophobicity was measured by water contact angle measurements. The water contact angle of the replica, made of UV cured polymer, was 132 0 ± 2 0 , which was slightly lower than that of the original cicada wing (138 0 ± 2 0 ), but much higher than that of the UV cured polymer surface without any nano-sized pillars (86 0 ).

  10. Plasmonic Nanostructures Prepared by Soft UV Nanoimprint Lithography and Their Application in Biological Sensing

    Directory of Open Access Journals (Sweden)

    Grégory Barbillon

    2012-01-01

    Full Text Available We prepared high-density plasmonic nanostructures on a glass substrate. By using soft UV nanoimprint lithography, gold nanodisks with a diameter of 65 nm were obtained on an area of 1 mm2. We tested these gold nanosensors in the biotin/streptavidin system to study their selectivity and sensitivity of detection. The prepared gold nanodisks could detect streptavidin at 10 pM.

  11. Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography

    Science.gov (United States)

    Ochiai, Kento; Kikuchi, Eri; Ishito, Yota; Kumagai, Mari; Nakamura, Takahiro; Nakagawa, Masaru

    2018-06-01

    We studied a fluorescent UV-curable resin suitable for fluorescence alignment in UV nanoimprinting. The addition of a cationic fluorescent dye caused radical photopolymerization of a UV-curable resin by exposure to visible excitation light for fluorescence microscope observation. The microscope observation of a resin film prepared by pressing resin droplets on a silica substrate with a fluorinated silica superstrate revealed that the cationic dye molecules were preferably adsorbed onto the silica surface. It was indicated that the dye molecules concentrated on the silica surface may cause the photocuring. A nonionic fluorescent dye was selected owing to its low polar symmetrical structure and its solubility parameter close to monomers. The fluorescent UV-curable resin with the nonionic dye showed uncured stability to exposure to visible excitation light for 30 min with a light intensity of 8.5 mW cm‑2 detected at 530 nm.

  12. Fabrication of the similar porous alumina silicon template for soft UV nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Tangyou [Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Xu, Zhimou, E-mail: xuzhimou@mail.hust.edu.cn [Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhao, Wenning; Wu, Xinghui; Liu, Sisi; Zhang, Zheng; Wang, Shuangbao; Liu, Wen [Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Liu, Shiyuan [State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China); Peng, Jing [College of Sciences, Wuhan University of Science and Technology, Wuhan 430081 (China)

    2013-07-01

    High density honeycombed nanostructures of porous alumina template (PAT) have been widely used to the fabrication of various electronic, optoelectronic, magnetic, and energy storage devices. However, patterning structures at sub-100 nm feature size with large area and low cost is of great importance and hardness on which semiconductor manufacture technology depends. In this paper, soft UV nanoimprint lithography (SUNIL) by using PAT as the initial mold is studied in detail. The results reveal a significant incompatibility between these two candidates. The native nonflatness of the PAT surface is about 100 nm in the range of 2–5 μm. Resist detaches from the substrate because of the mold deformation in the nonflat SUNIL. A two-inch similar porous alumina silicon (Si) template with nanopore size of 50–100 nm is fabricated. I–t curve conducted anodization and subsequent inductive coupled plasma (ICP) dry etching are applied to ensure the uniformity of the fabricated template. The surface flatness of the similar porous alumina Si template is the same as the polished Si wafer, which perfectly matches NIL.

  13. Photonic crystal structures on nonflat surfaces fabricated by dry lift-off soft UV nanoimprint lithography

    International Nuclear Information System (INIS)

    Sun, Tangyou; Xu, Zhimou; Xu, Haifeng; Zhao, Wenning; Wu, Xinghui; Liu, Sisi; Ma, Zhichao; He, Jian; Liu, Shiyuan; Peng, Jing

    2013-01-01

    The surface nonflatness induced from the material itself or the production atmosphere can lead to serious non-uniformity consequences in nanoimprint lithography (NIL) which is used for providing a low cost and high throughput nano-fabrication process. In this paper, soft UV NIL (SUNIL) processes are used for photonic crystal (PC) pattern transfer of a GaN-based light-emitting diode (LED) with patterned sapphire substrate (PSS). The results reveal a significant incompatibility between the conventional SUNIL and the nonflat p-GaN surface. Ellipse-shaped rather than circle-shaped PC structure is obtained on the p-GaN surface due the deformation of the soft mold in nonflat NIL. A dry lift-off (DLO) SUNIL is proposed to overcome the non-uniformity issue in nonflat NIL as well as the collapse problem of the free-standing pillar-shaped resist in wet lift-off. The photoluminescence enhancements of the LED fabricated by the DLO SUNIL method compared to those with conventional SUNIL and unpatterned LED are 1.41 fold and 3.48 fold, respectively. Further study shows that the DLO SUNIL is applicable in the fabrication of the PC structure with tunable duty cycle via one single initial PC mold. (paper)

  14. An oxygen-insensitive degradable resist for fabricating metallic patterns on highly curved surfaces by UV-nanoimprint lithography.

    Science.gov (United States)

    Hu, Xin; Huang, Shisong; Gu, Ronghua; Yuan, Changsheng; Ge, Haixiong; Chen, Yanfeng

    2014-10-01

    In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com-prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa-spiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  15. Transfer the multiscale texture of crystalline Si onto thin-film micromorph cell by UV nanoimprint for light trapping

    Science.gov (United States)

    Liu, Daiming; Wang, Qingkang; Wang, Qing

    2018-05-01

    Surface texturing is of great significance in light trapping for solar cells. Herein, the multiscale texture, consisting of microscale pyramids and nanoscale porous arrangement, was fabricated on crystalline Si by KOH etching and Ag-assisted HF etching processes and subsequently replicated onto glass with high fidelity by UV nanoimprint method. Light trapping of the multiscale texture was studied by spectral (reflectance, haze ratio) characterizations. Results reveal the multiscale texture provides the broadband reflection reducing, the highlighted light scattering and the additional self-cleaning behaviors. Compared with bare cell, the multiscale textured micromorph cell achieves a 4% relative increase in power conversion efficiency. This surface texturing route paves a promising way for developing low-cost, large-scale and high-efficiency solar applications.

  16. The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint.

    Science.gov (United States)

    Guo, Shuai; Niu, Chunhui; Liang, Liang; Chai, Ke; Jia, Yaqing; Zhao, Fangyin; Li, Ya; Zou, Bingsuo; Liu, Ruibin

    2016-10-04

    Based on a silica sol-gel technique, highly-structurally ordered silica photonic structures were fabricated by UV lithography and hot manual nanoimprint efforts, which makes large-scale fabrication of silica photonic crystals easy and results in low-cost. These photonic structures show perfect periodicity, smooth and flat surfaces and consistent aspect ratios, which are checked by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In addition, glass substrates with imprinted photonic nanostructures show good diffraction performance in both transmission and reflection mode. Furthermore, the reflection efficiency can be enhanced by 5 nm Au nanoparticle coating, which does not affect the original imprint structure. Also the refractive index and dielectric constant of the imprinted silica is close to that of the dielectric layer in nanodevices. In addition, the polarization characteristics of the reflected light can be modulated by stripe nanostructures through changing the incident light angle. The experimental findings match with theoretical results, making silica photonic nanostructures functional integration layers in many optical or optoelectronic devices, such as LED and microlasers to enhance the optical performance and modulate polarization properties in an economical and large-scale way.

  17. Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moiré fringes

    International Nuclear Information System (INIS)

    Wang, Qinghua; Kishimoto, Satoshi

    2012-01-01

    In this study, the residual stress in a resist (PAK01) film and the stress intensity factor (SIF) of an induced crack are simultaneously estimated during ultraviolet nanoimprint lithography (UV-NIL) based on electron moiré fringes. A micro grid in a triangular arrangement on the resist film fabricated by UV-NIL is directly used as the model grid. Electron moiré fringes formed by the interference between the fabricated grid and the electron scan beam are used to measure the displacement distribution around the tip of a crack induced by the residual stress in the resist. The SIF of the crack is estimated using a displacement extrapolation method. The residual strain fields and the corresponding residual stress in the resist film far from the crack are determined and analyzed. This method is effective for evaluating the grid quality fabricated by the UV-NIL technique. (paper)

  18. Efficient methods of nanoimprint stamp cleaning based on imprint self-cleaning effect

    Energy Technology Data Exchange (ETDEWEB)

    Meng Fantao; Chu Jinkui [Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, 116024 Dalian (China); Luo Gang; Zhou Ye; Carlberg, Patrick; Heidari, Babak [Obducat AB, SE-20125 Malmoe (Sweden); Maximov, Ivan; Montelius, Lars; Xu, H Q [Division of Solid State Physics, Lund University, Box 118, S-22100 Lund (Sweden); Nilsson, Lars, E-mail: ivan.maximov@ftf.lth.se [Department of Food Technology, Engineering and Nutrition, Lund University, Box 117, S-22100 Lund (Sweden)

    2011-05-06

    Nanoimprint lithography (NIL) is a nonconventional lithographic technique that promises low-cost, high-throughput patterning of structures with sub-10 nm resolution. Contamination of nanoimprint stamps is one of the key obstacles to industrialize the NIL technology. Here, we report two efficient approaches for removal of typical contamination of particles and residual resist from stamps: thermal and ultraviolet (UV) imprinting cleaning-both based on the self-cleaning effect of imprinting process. The contaminated stamps were imprinted onto polymer substrates and after demolding, they were treated with an organic solvent. The images of the stamp before and after the cleaning processes show that the two cleaning approaches can effectively remove contamination from stamps without destroying the stamp structures. The contact angles of the stamp before and after the cleaning processes indicate that the cleaning methods do not significantly degrade the anti-sticking layer. The cleaning processes reported in this work could also be used for substrate cleaning.

  19. The effect of UV-blocking contact lenses as a therapy for canine chronic superficial keratitis.

    Science.gov (United States)

    Denk, Nora; Fritsche, Jens; Reese, Sven

    2011-05-01

    To evaluate the effect of UV-blocking soft contact lenses in treatment for chronic superficial keratitus (CSK). Twenty six dogs with CSK were treated continuously with UV-blocking contact lenses for 6 months. A contact lens was placed on one eye of each dog; the other eye remained without a lens as a control eye. After this primary study, five of the dogs were further treated and they wore then contact lenses in both eyes. Continuously, all patients were concurrently treated topically with cyclosporine. The contact lenses were changed every 4 weeks and an ophthalmic examination performed. Evaluation criteria included corneal alterations as pigmentation, edema, pannus and vascularization. To determine the transmittance characteristics of the contact lenses before and after use, 32 contact lenses were measured with a UV-vis-NIR spectrophotometer. Pigmentation increased in eyes wearing lenses and in control eyes over the evaluation period of 6 months. Corneal edema increased in the eyes wearing lenses, but remained unaffected in the control eyes. A significant difference in the incidence of pannus and the extent of corneal vascularisation could not be evaluated. Adverse effects were noted in six cases (corneal edema and vascularisation, conjunctivitis, blepharospasm). All new lenses studied reduced UV-radiation to a safe level, whereas used lenses did not maintain their transmittance characteristics. No positive effect of UV-blocking contact lenses could be proven with the study design used. © 2011 American College of Veterinary Ophthalmologists.

  20. Combined nano-imprint and photolithography (CNP) of integrated polymer optics

    DEFF Research Database (Denmark)

    Christiansen, Mads Brøkner; Schøler, Mikkel; Kristensen, Anders

    2007-01-01

    is softened by heating, and UV exposed. Hereby the mm to /mi sized features are defined by the UV exposure through the metal mask, while nm-scale features are formed by mechanical deformation (nanoimprinting). The UV exposed (and imprinted) SU-8 is crosslinked by a post-exposure bake, before the stamp...

  1. Nanoimprinted polymer lasers with threshold below 100 W/cm2 using mixed-order distributed feedback resonators.

    Science.gov (United States)

    Wang, Yue; Tsiminis, Georgios; Kanibolotsky, Alexander L; Skabara, Peter J; Samuel, Ifor D W; Turnbull, Graham A

    2013-06-17

    Organic semiconductor lasers were fabricated by UV-nanoimprint lithography with thresholds as low as 57 W/cm(2) under 4 ns pulsed operation. The nanoimprinted lasers employed mixed-order distributed feedback resonators, with second-order gratings surrounded by first-order gratings, combined with a light-emitting conjugated polymer. They were pumped by InGaN LEDs to produce green-emitting lasers, with thresholds of 208 W/cm(2) (102 nJ/pulse). These hybrid lasers incorporate a scalable UV-nanoimprint lithography process, compatible with high-performance LEDs, therefore we have demonstrated a coherent, compact, low-cost light source.

  2. Nanoimprinted organic semiconductor laser pumped by a light-emitting diode.

    Science.gov (United States)

    Tsiminis, Georgios; Wang, Yue; Kanibolotsky, Alexander L; Inigo, Anto R; Skabara, Peter J; Samuel, Ifor D W; Turnbull, Graham A

    2013-05-28

    An organic semiconductor laser, simply fabricated by UV-nanoimprint lithography (UV-NIL), that is pumped with a pulsed InGaN LED is demonstrated. Molecular weight optimization of the polymer gain medium on a nanoimprinted polymer distributed feedback resonator enables the lowest reported UV-NIL laser threshold density of 770 W cm(-2) , establishing the potential for scalable organic laser fabrication compatible with mass-produced LEDs. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  3. UV-vis light transmittance through tinted contact lenses and the effect of color on values.

    Science.gov (United States)

    Osuagwu, Uchechukwu L; Ogbuehi, Kelechi C

    2014-06-01

    To assess the transmittance, in the 200-700nm electromagnetic radiation spectrum, by popularly used tinted soft contact lenses (CLs). The spectra transmittances of ultraviolet (UV)-blocking (I Day Acuvue Define, Freshlook ONE DAY) and non-UV-blocking (Durasoft 3, Tutti, and NeoCosmo) tinted soft CLs were tested. The transmittance of each lens, including nine different colors of Freshlook CL was recorded on spectrophotometer, and the data used to also calculate a UV protection factor (PF) for each lens brand tested, with a higher value indicating a higher level of protection. The UV-blocking CLs significantly reduced UVC, UVB & UVA transmission and thereby meet the American National Standards Institution standard for class 2 UV blockers: a maximum of 30% transmittance of UVA and 5% transmittance of UVB wavelengths. In contrast, the Durasoft 3, Tutti, and NeoCosmo CLs demonstrated negligible UV-blockage. The Acuvue Define CL offered the greatest protection from UVC (PF=69) and UVB (PF=55), but with only 35% luminous transmittance, while the Freshlook CL (especially gemstone green) offered the best protection from UVA (PF=24) and showed about 55% translucency. Overall, the UV-blocking CLs performed equally well across the UV spectrum. Different colors of Freshlook CL transmitted statistically and clinically significantly different amounts of visible light but similar amounts of UVR. Freshlook and Acuvue Define CLs which are designated as UV-blockers significantly reduced UVR transmission to safe levels whereas Tutti, NeoCosmo and Durasoft 3 did not. Transmission within the Freshlook CL family was more dependent on color in the visible light spectrum, but not in the UV-spectrum, where the gemstone green performing best among the tested colors. Copyright © 2013 British Contact Lens Association. Published by Elsevier Ltd. All rights reserved.

  4. Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling

    International Nuclear Information System (INIS)

    Köpplmayr, Thomas; Häusler, Lukas; Bergmair, Iris; Mühlberger, Michael

    2015-01-01

    Fused deposition modelling (FDM) is an additive manufacturing technology commonly used for modelling, prototyping and production applications. The achievable surface roughness is one of its most limiting aspects. It is however of great interest to create well-defined (nanosized) patterns on the surface for functional applications such as optical effects, electronics or bio-medical devices. We used UV-curable polymers of different viscosities and flexible stamps made of poly(dimethylsiloxane) (PDMS) to perform Nanoimprint Lithography (NIL) on FDM-printed curved parts. Substrates with different roughness and curvature were prepared using a commercially available 3D printer. The nanoimprint results were characterized by optical light microscopy, profilometry and atomic force microscopy (AFM). Our experiments show promising results in creating well-defined microstructures on the 3D-printed parts. (paper)

  5. Effects of polymer surface energy on morphology and properties of silver nanowire fabricated via nanoimprint and E-beam evaporation

    Science.gov (United States)

    Zhao, Zhi-Jun; Hwang, Soon Hyoung; Jeon, Sohee; Jung, Joo-Yun; Lee, Jihye; Choi, Dae-Geun; Choi, Jun-Hyuk; Park, Sang-Hu; Jeong, Jun-Ho

    2017-10-01

    In this paper, we demonstrate that use of different nanoimprint resins as a polymer pattern has a significant effect on the morphology of silver (Ag) nanowires deposited via an E-beam evaporator. RM-311 and Ormo-stamp resins are chosen as a polymer pattern to form a line with dimensions of width (100 nm) × space (100 nm) × height (120 nm) by using nanoimprint lithography (NIL). Their contact angles are then measured to evaluate their surface energies. In order to compare the properties of the Ag nanowires deposited on the various polymer patterns with different surface energies, hydrophobic surface treatment of the polymer pattern surface is implemented using self-assembled monolayers. In addition, gold and aluminum nanowires are fabricated for comparison with the Ag nanowires, with the differences in the nanowire morphologies being determined by the different atomic properties. The monocrystalline and polycrystalline structures of the various Ag nanowire formations are observed using transmission electron microscopy. In addition, the melting temperatures and optical properties of four kinds of Ag nanowire morphologies deposited on various polymer patterns are evaluated using a hot plate and an ultraviolet-visible (UV-vis) spectrometer, respectively. The results indicate that the morphology of the Ag nanowire determines the melting temperature and the transmission. We believe that these findings will greatly aid the development of NIL, along with physical evaporation and chemical deposition techniques, and will be widely employed in optics, biology, and surface wettability applications.

  6. Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography

    NARCIS (Netherlands)

    Khan, M.U.; Justice, J.; Petäjä, J.; Korhonen, T.; Boersma, A.; Wiegersma, S.; Karppinen, M.; Corbett, B.

    2015-01-01

    Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index

  7. Nanoimprinted distributed feedback lasers comprising TiO2 thin films

    DEFF Research Database (Denmark)

    Vannahme, Christoph; Smith, Cameron; Leung, Michael C.

    2013-01-01

    Design guidelines for optimizing the sensing performance of nanoimprinted second order distributed feedback dye lasers are presented. The guidelines are verified by experiments and simulations. The lasers, fabricated by UV-nanoimprint lithography into Pyrromethene doped Ormocomp thin films on glass......, have their sensor sensitivity enhanced by a factor of up to five via the evaporation of a titanium dioxide (TiO2) waveguiding layer. The influence of the TiO2 layer thickness on the device sensitivity is analyzed with a simple model that accurately predicts experimentally measured wavelength shifts...

  8. Fabrication of Nanoimprint stamps for photonic crystals

    International Nuclear Information System (INIS)

    Kouba, J; Kubenz, M; Mai, A; Ropers, G; Eberhardt, W; Loechel, B

    2006-01-01

    We report on fabrication of nanoimprint stamps for fabrication of two dimensional photonic crystals in visible range of spectra. Nanoimprint stamps made of silicon and/or nickel were successfully fabricated using electron beam lithography and advanced dry etching techniques. The quality of the stamps was evaluated using scanning electron microscopy. The fabricated stamps were also evaluated by imprinting them into suitable polymer materials

  9. Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography

    International Nuclear Information System (INIS)

    Altun, Ali Ozhan; Jeong, Jun-Ho; Rha, Jong-Joo; Kim, Ki-Don; Lee, Eung-Sug

    2007-01-01

    Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70-86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75 0 . The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin

  10. Prevention of the adverse photic effects of peripheral light-focusing using UV-blocking contact lenses.

    Science.gov (United States)

    Kwok, L Stephen; Kuznetsov, Valerian A; Ho, Arthur; Coroneo, Minas T

    2003-04-01

    Peripheral light-focusing (PLF) is an occult form of ultraviolet radiation (UVR) hazardous to the human eye. In PLF, obliquely incident light is refracted from the peripheral cornea to concentrated sites inside the anterior segment. In the current study, the directionality of this phenomenon for UVR and whether PLF is established in outdoor settings exposed to sunlight were investigated. The protection provided by a UV-blocking contact lens was also evaluated. UVA and UVB sensors were placed on the nasal limbus of an anatomically based model eye. The temporal limbus was exposed to a UV light source placed at various angles behind the frontal plane. PLF was quantified with the sensor output. The ensemble was mounted in the orbit of a mannequin head and exposed to sunlight in three insolation environments within the region of Sydney, Australia. PLF for UVA and UVB was determined with no eyewear or with sunglasses and commercially available soft contact lenses, with and without UV-blocking capability. The intensity of UVA peaked at approximately 120 degrees incidence, the level at which the UVB response was also at its maximum. The intensification of UVA was up to x18.3. The intensity of PLF for UVA and UVB was reduced by an order of magnitude by a UV-blocking contact lens, whereas a clear contact lenses had a much lesser effect. Only the UV-blocking contact lens achieved a significant effect on UVA and UVB irradiance in the urban, beach, and mountain locales (P UV-blocking soft contact lenses. Sunglasses may be unable to shield oblique rays, unless side protection is incorporated. Contact lenses can offer UVR protection against all angles of incidence, including the peak-response angle. They can also protect the eye in settings in which the wearing of sunglasses is not feasible or convenient.

  11. Simple micro-patterning of high conductive polymer with UV-nano-imprinted patterned substrate and ethylene glycol-based second doping

    International Nuclear Information System (INIS)

    Takamatsu, Seiichi; Kurihara, Kazuma; Yamashita, Takahiro; Itoh, Toshihiro

    2014-01-01

    We have developed a simple micro-patterning process for high conductive polymer (i.e., poly (3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS)) with a patterned substrate by using an ultraviolet (UV) nano-imprint and an ethylene glycol-based second doping technique. In the patterning process, the PEDOT:PSS water dispersion is first coated only on the hydrophilic area, which is fabricated by UV nano-imprinting, forming patterned PEDOT:PSS on the substrate. The patterned PEDOT:PSS film is then immersed in the ethylene glycol as a second doping technique for increasing its conductivity. The proposed process provides simplicity in terms of shorter process steps of the UV nano-imprinting and PEDOT:PSS coating and higher conductivity of patterned PEDOT:PSS film than existing complicated micro-fabrication processes for organic materials. The 200 nm wide nano-imprinted pillar structures change the wettability of the substrate where the contact angle of the substrate is decreased from 66.8° to 33.3°. The patterning resolution with the nano-imprinted pattern substrate is down to 100 µm, which is useful for sensor applications. The conductivity increase delivers a low sheet resistance (120 Ω sq −1 ) of patterned PEDOT:PSS film. Then, the patterning of PEDOT:PSS sensor shapes with its 300 µm wide feature line and high conductivity are demonstrated. Therefore, our process leads to applications to a variety of PEDOT:PSS-based sensors. (paper)

  12. Nanoimprint lithography for microfluidics manufacturing

    Science.gov (United States)

    Kreindl, Gerald; Matthias, Thorsten

    2013-12-01

    The history of imprint technology as lithography method for pattern replication can be traced back to 1970's but the most significant progress has been made by the research group of S. Chou in the 1990's. Since then, it has become a popular technique with a rapidly growing interest from both research and industrial sides and a variety of new approaches have been proposed along the mainstream scientific advances. Nanoimprint lithography (NIL) is a novel method for the fabrication of micro/nanometer scale patterns with low cost, high throughput and high resolution. Unlike traditional optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional lithographic techniques. The ability to fabricate structures from the micro- to the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of micro- and nanotechnology and the biotech- sciences as a whole and will be discussed in this paper. Nanoimprinting can not only create resist patterns, as in lithography, but can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

  13. Nano-Imprint Lithography: Nanonex NX-2000

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: NanoimprinterThis tool creates a pattern in a thin resist by embossing from a mold. The pattern is later transferred to the wafer by reactive...

  14. Nano-imprint gold grating as refractive index sensor

    International Nuclear Information System (INIS)

    Kumari, Sudha; Mohapatra, Saswat; Moirangthem, Rakesh S.

    2016-01-01

    Large scale of fabrication of plasmonic nanostructures has been a challenging task due to time consuming process and requirement of expensive nanofabrication tools such as electron beam lithography system, focused ion beam system, and extreme UV photolithography system. Here, we present a cost-effective fabrication technique so called soft nanoimprinting to fabricate nanostructures on the larger sample area. In our fabrication process, a commercially available optical DVD disc was used as a template which was imprinted on a polymer glass substrate to prepare 1D polymer nano-grating. A homemade nanoimprinting setup was used in this fabrication process. Further, a label-free refractive index sensor was developed by utilizing the properties of surface plasmon resonance (SPR) of a gold coated 1D polymer nano-grating. Refractive index sensing was tested by exposing different solutions of glycerol-water mixture on the surface of gold nano-grating. The calculated bulk refractive index sensitivity was found to be 751nm/RIU. We believed that our proposed SPR sensor could be a promising candidate for developing low-cost refractive index sensor with high sensitivity on a large scale.

  15. Gaz Phase IR and UV Spectroscopy of Neutral Contact Ion Pairs

    Science.gov (United States)

    Habka, Sana; Brenner, Valerie; Mons, Michel; Gloaguen, Eric

    2016-06-01

    Cations and anions, in solution, tend to pair up forming ion pairs. They play a crucial role in many fundamental processes in ion-concentrated solutions and living organisms. Despite their importance and vast applications in physics, chemistry and biochemistry, they remain difficult to characterize namely because of the coexistence of several types of pairing in solution. However, an interesting alternative consists in applying highly selective gas phase spectroscopy which can offer new insights on these neutral ion pairs. Our study consists in characterizing contact ion pairs (CIPs) in isolated model systems (M+, Ph-(CH2)n-COO- with M=Li, Na, K, Rb, Cs, and n=1-3), to determine their spectral signatures and compare them to ion pairs in solution. We have used laser desorption to vaporize a solid tablet containing the desired salt. Structural information for each system was obtained by mass-selective, UV and IR laser spectroscopy combined with high level quantum chemistry calculations1. Evidence of the presence of neutral CIPs was found by scanning the π-π* transition of the phenyl ring using resonant two-photon ionization (R2PI). Then, conformational selective IR/UV double resonance spectra were recorded in the CO2- stretch region for each conformation detected. The good agreement between theoretical data obtained at the BSSE-corrected-fullCCSD(T)/dhf-TZVPP//B97-D3/dhf-TZVPP level and experimental IR spectra led us to assign the 3D structure for each ion pair formed. Spectral signatures of (M+, Ph-CH2-COO-) pairs, were assigned to a bidentate CIPs between the alkali cation and the carboxylate group. In the case of (Li+, Ph-(CH2)3-COO-) pairs, the presence of a flexible side chain promotes a cation-π interaction leading to a tridentate O-O-π structure with its unique IR and UV signatures. IR spectra obtained on isolated CIPs were found very much alike the ones published on lithium and sodium acetate in solution2. However, in the case of sodium acetate, solution

  16. Scanning probe lithography for nanoimprinting mould fabrication

    International Nuclear Information System (INIS)

    Luo Gang; Xie Guoyong; Zhang Yongyi; Zhang Guoming; Zhang Yingying; Carlberg, Patrick; Zhu Tao; Liu Zhongfan

    2006-01-01

    We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si(110) and Si(100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 μm by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds

  17. Discrete dislocation simulations of the flattening of nanoimprinted surfaces

    International Nuclear Information System (INIS)

    Zhang, Yunhe; Nicola, Lucia; Van der Giessen, Erik

    2010-01-01

    Simulations of rough surface flattening are performed on thin metal films whose roughness is created by nanoimprinting flat single crystals. The imprinting is carried out by means of a rigid template with equal flat contacts at varying spacing. The imprinted surfaces are subsequently flattened by a rigid platen, while the change of roughness and surface profile is computed. Attention is focused mainly on comparing the response of the film surfaces with those of identical films cleared of the dislocations and residual stresses left by the imprinting process. The aim of these studies is to understand to what extent the loading history affects deformation and roughness during flattening. The limiting cases of sticking and frictionless contact between rough surface and platen are analyzed. Results show that when the asperities are flattened such that the contact area is up to about one third of the surface area, the loading history strongly affects the flattening. Specifically, the presence of initial dislocations facilitates the squeezing of asperities independently of the friction conditions of the contact. For larger contact areas, the initial conditions affect only sticking contacts, while frictionless contacts lead to a homogeneous flattening of the asperities due to yield of the metal film. In all cases studied the final surface profile obtained after flattening has little to no resemblance to the original imprinted surface

  18. Mesoscopic Oxide Double Layer as Electron Specific Contact for Highly Efficient and UV Stable Perovskite Photovoltaics.

    Science.gov (United States)

    Tavakoli, Mohammad Mahdi; Giordano, Fabrizio; Zakeeruddin, Shaik Mohammed; Grätzel, Michael

    2018-04-11

    The solar to electric power conversion efficiency (PCE) of perovskite solar cells (PSCs) has recently reached 22.7%, exceeding that of competing thin film photovoltaics and the market leader polycrystalline silicon. Further augmentation of the PCE toward the Shockley-Queisser limit of 33.5% warrants suppression of radiationless carrier recombination by judicious engineering of the interface between the light harvesting perovskite and the charge carrier extraction layers. Here, we introduce a mesoscopic oxide double layer as electron selective contact consisting of a scaffold of TiO 2 nanoparticles covered by a thin film of SnO 2 , either in amorphous (a-SnO 2 ), crystalline (c-SnO 2 ), or nanocrystalline (quantum dot) form (SnO 2 -NC). We find that the band gap of a-SnO 2 is larger than that of the crystalline (tetragonal) polymorph leading to a corresponding lift in its conduction band edge energy which aligns it perfectly with the conduction band edge of both the triple cation perovskite and the TiO 2 scaffold. This enables very fast electron extraction from the light perovskite, suppressing the notorious hysteresis in the current-voltage ( J-V) curves and retarding nonradiative charge carrier recombination. As a result, we gain a remarkable 170 mV in open circuit photovoltage ( V oc ) by replacing the crystalline SnO 2 by an amorphous phase. Because of the quantum size effect, the band gap of our SnO 2 -NC particles is larger than that of bulk SnO 2 causing their conduction band edge to shift also to a higher energy thereby increasing the V oc . However, for SnO 2 -NC there remains a barrier for electron injection into the TiO 2 scaffold decreasing the fill factor of the device and lowering the PCE. Introducing the a-SnO 2 coated mp-TiO 2 scaffold as electron extraction layer not only increases the V oc and PEC of the solar cells but also render them resistant to UV light which forebodes well for outdoor deployment of these new PSC architectures.

  19. Multilength Scale Patterning of Functional Layers by Roll-to-Roll Ultraviolet-Light-Assisted Nanoimprint Lithography.

    Science.gov (United States)

    Leitgeb, Markus; Nees, Dieter; Ruttloff, Stephan; Palfinger, Ursula; Götz, Johannes; Liska, Robert; Belegratis, Maria R; Stadlober, Barbara

    2016-05-24

    Top-down fabrication of nanostructures with high throughput is still a challenge. We demonstrate the fast (>10 m/min) and continuous fabrication of multilength scale structures by roll-to-roll UV-nanoimprint lithography on a 250 mm wide web. The large-area nanopatterning is enabled by a multicomponent UV-curable resist system (JRcure) with viscous, mechanical, and surface properties that are tunable over a wide range to either allow for usage as polymer stamp material or as imprint resist. The adjustable elasticity and surface chemistry of the resist system enable multistep self-replication of structured resist layers. Decisive for defect-free UV-nanoimprinting in roll-to-roll is the minimization of the surface energies of stamp and resist, and the stepwise reduction of the stiffness from one layer to the next is essential for optimizing the reproduction fidelity especially for nanoscale features. Accordingly, we demonstrate the continuous replication of 3D nanostructures and the high-throughput fabrication of multilength scale resist structures resulting in flexible polyethylenetherephtalate film rolls with superhydrophobic properties. Moreover, a water-soluble UV-imprint resist (JRlift) is introduced that enables residue-free nanoimprinting in roll-to-roll. Thereby we could demonstrate high-throughput fabrication of metallic patterns with only 200 nm line width.

  20. Flexible and disposable plasmonic refractive index sensor using nanoimprint lithography

    Science.gov (United States)

    Mohapatra, Saswat; Moirangthem, Rakesh S.

    2018-03-01

    Nanostructure based plasmonic sensors are highly demanding in various areas due to their label-free and real-time detection capability. In this work, we developed an inexpensive flexible plasmonic sensor using optical disc nanograting via soft UV-nanoimprint lithography (UV-NIL). The polydimethylsiloxane (PDMS) stamp was used to transfer the nanograting structure from digital versatile discs (DVDs) to flexible and transparent polyethylene terephthalate (PET) substrate. Further, the plasmonic sensing substrate was obtained after coating a gold thin film on the top of the imprinted sample. The surface plasmon resonance (SPR) modes excited on gold coated nanograting structure appeared as a dip in the reflectance spectra measured at normal incident of white light in ambient air medium. Electromagnetic simulation based on finite element method (FEM) was used to understand and analyze the excited SPR modes and it is a very close agreement with the experimental results. The bulk refractive index (RI) sensing was performed by the sensor chip using water-glycerol mixture with different concentrations. Experimentally, the bulk RI sensitivity was found to be 797+/-17 nm/RIU.

  1. Fabrication of biopolymer cantilevers using nanoimprint lithography

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Feidenhans'l, Nikolaj Agentoft; Fisker-Bødker, Nis

    2011-01-01

    The biodegradable polymer poly(l-lactide) (PLLA) was introduced for the fabrication of micromechanical devices. For this purpose, thin biopolymer films with thickness around 10 μm were spin-coated on silicon substrates. Patterning of microcantilevers is achieved by nanoimprint lithography. A major...... challenge was the high adhesion between PLLA and silicon stamp. Optimized stamp fabrication and the deposition of a 125 nm thick fluorocarbon anti-stiction coating on the PLLA allowed the fabrication of biopolymer cantilevers. Resonance frequency measurements were used to estimate the Young’s modulus...

  2. Fabrication of a Ni nano-imprint stamp for an anti-reflective layer using an anodic aluminum oxide template.

    Science.gov (United States)

    Park, Eun-Mi; Lim, Seung-Kyu; Ra, Senug-Hyun; Suh, Su-Jung

    2013-11-01

    Aluminum anodizing can alter pore diameter, density distribution, periodicity and layer thickness in a controlled way. Because of this property, porous type anodic aluminum oxide (AAO) was used as a template for nano-structure fabrication. The alumina layer generated at a constant voltage increased the pore size from 120 nm to 205 nm according to an increasing process time from 60 min to 150 min. The resulting fabricated AAO templates had pore diameters at or less than 200 nm. Ni was sputtered as a conductive layer onto this AAO template and electroplated using DC and pulse power. Comparing these Ni stamps, those generated from electroplating using on/reverse/off pulsing had an ordered pillar array and maintained the AAO template morphology. This stamp was used for nano-imprinting on UV curable resin coated glass wafer. Surface observations via electron microscopy showed that the nano-imprinted patterned had the same shape as the AAO template. A soft mold was subsequently fabricated and nano-imprinted to form a moth-eye structure on the glass wafer. An analysis of the substrate transmittance using UV-VIS/NIR spectroscopy showed that the transmittance of the substrate with the moth-eye structure was 5% greater that the non-patterned substrate.

  3. Thermo-curable epoxy systems for nanoimprint lithography

    International Nuclear Information System (INIS)

    Wu, Chun-Chang; Hsu, Steve Lien-Chung

    2010-01-01

    In this work, we have used solvent-free thermo-curable epoxy systems for low-pressure and moderate-temperature nanoimprint lithography (NIL). The curing kinetic parameters and conversion of diglycidyl ether of bisphenol A (DGEBA) resin with different ambient-cure 930 and 954 hardeners were studied by the isothermal DSC technique. They are useful for the study of epoxy resins in the imprinting application. The DGEBA/930 and DGEBA/954 epoxy resists can be imprinted to obtain high-density nano- and micro-scale patterns on a flexible indium tin oxide/poly(ethylene terephthalate) (ITO/PET) substrate. The DGEBA/930 epoxy resin is not only suitable for resist material, but also for plastic mold material. Highly dense nanometer patterns can be successfully imprinted using a UV-curable resist from the DGEBA/930 epoxy mold. Using the replicated DGEBA/930 epoxy mold instead of the expensive master can prevent brittle failure of the silicon molds in the NIL

  4. Fluid management in roll-to-roll nanoimprint lithography

    Science.gov (United States)

    Jain, A.; Bonnecaze, R. T.

    2013-06-01

    The key process parameters of UV roll-to-roll nanoimprint lithography are identified from an analysis of the fluid, curing, and peeling dynamics. The process includes merging of droplets of imprint material, curing of the imprint material from a viscous liquid to elastic solid resist, and pattern replication and detachment of the resist from template. The time and distances on the web or rigid substrate over which these processes occur are determined as function of the physical properties of the uncured liquid, the cured solid, and the roller configuration. The upper convected Maxwell equation is used to model the viscoelastic liquid and to calculate the force on the substrate and the torque on the roller. The available exposure time is found to be the rate limiting parameter and it is O(√Rho /uo), where R is the radius of the roller, ho is minimum gap between the roller and web, and uo is the velocity of the web. The residual layer thickness of the resist should be larger than the gap between the roller and the substrate to ensure complete feature filling and optimal pattern replication. For lower residual layer thickness, the droplets may not merge to form a continuous film for pattern transfer.

  5. Scalable fabrication of nanostructured devices on flexible substrates using additive driven self-assembly and nanoimprint lithography

    Science.gov (United States)

    Watkins, James

    2013-03-01

    Roll-to-roll (R2R) technologies provide routes for continuous production of flexible, nanostructured materials and devices with high throughput and low cost. We employ additive-driven self-assembly to produce well-ordered polymer/nanoparticle hybrid materials that can serve as active device layers, we use highly filled nanoparticle/polymer hybrids for applications that require tailored dielectric constant or refractive index, and we employ R2R nanoimprint lithography for device scale patterning. Specific examples include the fabrication of flexible floating gate memory and large area films for optical/EM management. Our newly constructed R2R processing facility includes a custom designed, precision R2R UV-assisted nanoimprint lithography (NIL) system and hybrid nanostructured materials coaters.

  6. Frequency and amplitude dependences of molding accuracy in ultrasonic nanoimprint technology

    International Nuclear Information System (INIS)

    Mekaru, Harutaka; Takahashi, Masaharu

    2009-01-01

    We use neither a heater nor ultraviolet lights, and are researching and developing an ultrasonic nanoimprint as a new nano-patterning technology. In our ultrasonic nanoimprint technology, ultrasonic vibration is not used as a heat generator instead of the heater. A mold is connected with an ultrasonic generator, and mold patterns are pushed down and pulled up at a high speed into a thermoplastic. Frictional heat is generated by ultrasonic vibration between mold patterns and thermoplastic patterns formed by an initial contact force. However, because frictional heat occurs locally, the whole mold is not heated. Therefore, a molding material can be comprehensively processed at room temperature. A magnetostriction actuator was built into our ultrasonic nanoimprint system as an ultrasonic generator, and the frequency and amplitude can be changed between dc–10 kHz and 0–4 µm, respectively. First, the ultrasonic nanoimprint was experimented by using this system on polyethylene terephthalate (PET, T g = 69 °C), whose the glass transition temperature (T g ) is comparatively low in engineering plastics, and it was ascertained that the most suitable elastic material for this technique was an ethyl urethane rubber. In addition, we used a changeable frequency of the magnetostriction actuator, and nano-patterns in an electroformed-Ni mold were transferred to a 0.5 mm thick sheet of PET, polymethylmethacrylate (PMMA) and polycarbonate (PC), which are typical engineering plastics, under variable molding conditions. The frequency and amplitude dependence of ultrasonic vibration to the molding accuracy were investigated by measuring depth and width of imprinted patterns. As a result, regardless of the molding material, the imprinted depth was changed drastically when the frequency exceeded 5 kHz. On the other hand, when the amplitude of ultrasonic vibration grew, the imprinted depth gradually deepened. Influence of the frequency and amplitude of ultrasonic vibration was not

  7. Inclined nanoimprinting lithography for 3D nanopatterning

    International Nuclear Information System (INIS)

    Liu Zhan; Bucknall, David G; Allen, Mark G

    2011-01-01

    We report a non-conventional shear-force-driven nanofabrication approach, inclined nanoimprint lithography (INIL), for producing 3D nanostructures of varying heights on planar substrates in a single imprinting step. Such 3D nanostructures are fabricated by exploiting polymer anisotropic dewetting where the degree of anisotropy can be controlled by the magnitude of the inclination angle. The feature size is reduced from micron scale of the template to a resultant nanoscale pattern. The underlying INIL mechanism is investigated both experimentally and theoretically. The results indicate that the shear force generated at a non-zero inclination angle induced by the INIL apparatus essentially leads to asymmetry in the polymer flow direction ultimately resulting in 3D nanopatterns with different heights. INIL removes the requirements in conventional nanolithography of either utilizing 3D templates or using multiple lithographic steps. This technique enables various 3D nanoscale devices including angle-resolved photonic and plasmonic crystals to be fabricated.

  8. Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

    International Nuclear Information System (INIS)

    Song, Sun-Sik; Kim, Eun-Uk; Jung, Hee-Soo; Kim, Ki-Seok; Jung, Gun-Young

    2009-01-01

    A two-step metal lift-off process using a selective etching recipe was demonstrated as a new technique for the reverse pattern fabrication of the features of a master stamp via a UV-based nanoimprint lithography technique. A transparent master stamp with repeated pillars (150 nm diameter at 300 nm pitch) was fabricated by using laser interference lithography and the subsequent dry-etching process. After nanoimprint lithography and the following gold (Au) lift-off process, the corresponding gold dots (20 nm height) were generated. A thin chromium layer (Cr, 5 nm) was then deposited and subjected to the aqua regia solution, which dissolved only Au dots. By using a selective wet etching recipe between gold (Au) and chromium (Cr) materials, a Cr layer with holes was reliably generated, which was used as an etching mask to transfer holes into the silicon substrate in the subsequent dry-etching process. Hole patterns with a diameter of 146 nm were inversely replicated faithfully from the master stamp with the corresponding pillars without a notable feature size distortion

  9. The development of 8 inch roll-to-plate nanoimprint lithography (8-R2P-NIL) system

    Science.gov (United States)

    Lee, Lai Seng; Mohamed, Khairudin; Ooi, Su Guan

    2017-07-01

    Growth in semiconductor and integrated circuit industry was observed in the past decennium of years for industrial technology which followed Moore's law. The line width of nanostructure to be exposed was influenced by the essential technology of photolithography. Thus, it is crucial to have a low cost and high throughput manufacturing process for nanostructures. Nanoimprint Lithography technique invented by Stephen Y. Chou was considered as major nanolithography process to be used in future integrated circuit and integrated optics. The drawbacks of high imprint pressure, high imprint temperature, air bubbles formation, resist sticking to mold and low throughput of thermal nanoimprint lithography on silicon wafer have yet to be solved. Thus, the objectives of this work is to develop a high throughput, low imprint force, room temperature UV assisted 8 inch roll to plate nanoimprint lithography system capable of imprinting nanostructures on 200 mm silicon wafer using roller imprint with flexible mold. A piece of resist spin coated silicon wafer was placed onto vacuum chuck drives forward by a stepper motor. A quartz roller wrapped with a piece of transparent flexible mold was used as imprint roller. The imprinted nanostructures were cured by 10 W, 365 nm UV LED which situated inside the quartz roller. Heat generated by UV LED was dissipated by micro heat pipe. The flexible mold detaches from imprinted nanostructures in a 'line peeling' pattern and imprint pressure was measured by ultra-thin force sensors. This system has imprinting speed capability ranging from 0.19 mm/s to 5.65 mm/s, equivalent to imprinting capability of 3 to 20 pieces of 8 inch wafers per hour. Speed synchronization between imprint roller and vacuum chuck was achieved by controlling pulse rate supplied to stepper motor which drive the vacuum chuck. The speed different ranging from 2 nm/s to 98 nm/s is achievable. Vacuum chuck height was controlled by stepper motor with displacement of 5 nm/step.

  10. Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy

    International Nuclear Information System (INIS)

    Wu Wei; Hu Min; Ou Fungsuong; Li Zhiyong; Williams, R Stanley

    2010-01-01

    We demonstrated a cost-effective and deterministic method of patterning 3D cone arrays over a large area by using nanoimprint lithography (NIL). Cones with tip radius of less than 10 nm were successfully duplicated onto the UV-curable imprint resist materials from the silicon cone templates. Such cone structures were shown to be a versatile platform for developing reliable, highly sensitive surface enhanced Raman spectroscopy (SERS) substrates. In contrast to the silicon nanocones, the SERS substrates based on the Au coated cones made by the NIL offered significant improvement of the SERS signal. A further improvement of the SERS signal was observed when the polymer cones were imprinted onto a reflective metallic mirror surface. A sub-zeptomole detection sensitivity for a model molecule, trans-1,2-bis(4-pyridyl)-ethylene (BPE), on the Au coated NIL cone surfaces was achieved.

  11. 3D Simulation of Nano-Imprint Lithography

    DEFF Research Database (Denmark)

    Román Marín, José Manuel; Rasmussen, Henrik K.; Hassager, Ole

    2010-01-01

    A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have...

  12. Generic nano-imprint process for fabrication of nanowire arrays

    NARCIS (Netherlands)

    Pierret, A.; Hocevar, M.; Diedenhofen, S.L.; Algra, R.E.; Vlieg, E.; Timmering, E.C.; Verschuuren, M.A.; Immink, W.G.G.; Verheijen, M.A.; Bakkers, E.P.A.M.

    2010-01-01

    A generic process has been developed to grow nearly defect-free arrays of (heterostructured) InP and GaP nanowires. Soft nano-imprint lithography has been used to pattern gold particle arrays on full 2inch substrates. After lift-off organic residues remain on the surface, which induce the growth of

  13. Fabrication of nanoparticle and protein nanostructures using nanoimprint lithography

    NARCIS (Netherlands)

    Maury, P.A.

    2007-01-01

    Nanoimprint lithography (NIL) was used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The resulting polymer template behaved as a physical barrier preventing the formation of a SAM in the covered

  14. Fast thermal nanoimprint lithography by a stamp with integrated heater

    DEFF Research Database (Denmark)

    Tormen, Massimo; Malureanu, Radu; Pedersen, Rasmus Haugstrup

    2008-01-01

    We propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz...

  15. Nanoimprint system development and status for high volume semiconductor manufacturing

    Science.gov (United States)

    Hiura, Hiromi; Takabayashi, Yukio; Takashima, Tsuneo; Emoto, Keiji; Choi, Jin; Schumaker, Phil

    2016-10-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography* (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. For imprint lithography, recent attention has been given to the areas of overlay, throughput, defectivity, and mask replication. This paper reviews progress in these critical areas. Recent demonstrations have proven that mix and match overlay of less than 5nm can achieved. Further reductions require a higher order correction system. Modeling and experimental data are presented which provide a path towards reducing the overlay errors to less than 3nm. Throughput is mainly impacted by the fill time of the relief images on the mask. Improvement in resist materials provides a solution that allows 15 wafers per hour per station, or a tool throughput of 60 wafers per hour. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. Finally, on the mask side, a new replication tool, the FPA-1100NR2 is

  16. Functional patterns obtained by nanoimprinting lithography and subsequent growth of polymer brushes

    International Nuclear Information System (INIS)

    Genua, A; AlduncIn, J A; Pomposo, J A; Grande, H; Kehagias, N; Reboud, V; Sotomayor, C; Mondragon, I; Mecerreyes, D

    2007-01-01

    In this work the growth of polymer brushes was combined with nanoimprint lithography (NIL) in order to obtain new functional nanopatterns. First, a functional thermoplastic methacrylic copolymer poly(methyl methacrylate-co-2-bromoisobutyryl-oxy-ethyl methacrylate) was synthesized. This copolymer was successfully patterned by NIL using a silicon stamp at 160 deg. C and 60 bar. Next, hydrophilic polymer brushes based on poly(3-sulfopropylmethacrylate) and hydrophobic polymer brushes based on a poly(fluorinated methacrylate) were grown on the imprinted surfaces. The surface properties of the patterned polymer were accordingly modified and, as a consequence, the water contact angle was modified from 80.3 deg. to 32.5 deg. in the case of the hydrophilic brushes and to 118.1 deg. in the case of the hydrophobic brushes. As an application we demonstrated the use of hydrophobic polymer brushes in order to modify the surface of polymeric stamps for NIL with self-demoulding properties

  17. V-groove plasmonic waveguides fabricated by nanoimprint lithography

    DEFF Research Database (Denmark)

    Fernandez-Cuesta, I.; Nielsen, R.B.; Boltasseva, Alexandra

    2007-01-01

    Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integra...... of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput. © 2007 American Vacuum Society......Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication...

  18. Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography

    Science.gov (United States)

    Youn, Sung-Won; Suzuki, Kenta; Hiroshima, Hiroshi

    2018-06-01

    A software program for modifying a mold design to obtain a uniform residual layer thickness (RLT) distribution has been developed and its validity was verified by UV-nanoimprint lithography (UV-NIL) simulation. First, the effects of granularity (G) on both residual layer uniformity and filling characteristics were characterized. For a constant complementary pattern depth and a granularity that was sufficiently larger than the minimum pattern width, filling time decreased with the decrease in granularity. For a pattern design with a wide density range and an irregular distribution, the choice of a small granularity was not always a good strategy since the etching depth required for a complementary pattern occasionally exceptionally increased with the decrease in granularity. On basis of the results obtained, the automated method was applied to a chip-scale pattern modification. Simulation results showed a marked improvement in residual layer thickness uniformity for a capacity-equalized (CE) mold. For the given conditions, the standard deviation of RLT decreased in the range from 1/3 to 1/5 in accordance with pattern designs.

  19. Polymer nanoimprinting using an anodized aluminum mold for structural coloration

    Science.gov (United States)

    Kikuchi, Tatsuya; Nishinaga, Osamu; Natsui, Shungo; Suzuki, Ryosuke O.

    2015-06-01

    Polymer nanoimprinting of submicrometer-scale dimple arrays with structural coloration was demonstrated. Highly ordered aluminum dimple arrays measuring 530-670 nm in diameter were formed on an aluminum substrate via etidronic acid anodizing at 210-270 V and subsequent anodic oxide dissolution. The nanostructured aluminum surface led to bright structural coloration with a rainbow spectrum, and the reflected wavelength strongly depends on the angle of the specimen and the period of the dimple array. The reflection peak shifts gradually with the dimple diameter toward longer wavelength, reaching 800 nm in wavelength at 670 nm in diameter. The shape of the aluminum dimple arrays were successfully transferred to a mercapto-ester ultra-violet curable polymer via self-assembled monolayer coating and polymer replications using a nanoimprinting technique. The nanostructured polymer surfaces with positively and negatively shaped dimple arrays also exhibited structural coloration based on the periodic nanostructure, and reflected light mostly in the visible region, 400-800 nm. This nanostructuring with structural coloration can be easily realized by simple techniques such as anodizing, SAM coating, and nanoimprinting.

  20. Plasma-assisted quartz-to-quartz direct bonding for the fabrication of a multilayered quartz template for nanoimprint lithography

    International Nuclear Information System (INIS)

    Lee, Jihye; Ali, Altun; Kim, Ki-don; Choi, Dae-guen; Choi, Jun-Hyuk; Jeong, Jun-ho; Kim, Jae-Hyun

    2010-01-01

    In this paper, a low-temperature plasma-assisted process is developed to realize a uniform, ultraviolet (UV) transparent and chemically inert quartz-to-quartz direct bonding. Two sets of pretests are performed in order to understand how the bond surface energy changes with the plasma exposure time and the wet etching of quartz, respectively. The developed technique is used to fabricate a multilayered quartz template for UV nanoimprint lithography (UV-NIL). The multilayered quartz template is fabricated by bonding a square piece of a standard quartz wafer, which is about 625 µm in thickness, to a wet-etched 6.35 mm thick quartz photomask plate. A fabricated multilayered template is loaded to the commercial UV-NIL tool Imprio(TM) 100, and NIL was performed successfully. The developed direct bonding technique makes it possible for standard quartz wafers, which are compatible with high-resolution semiconductor fabrication processes, to be utilized as the templates in commercial UV-NIL machines with enhanced mechanical stability.

  1. A Class I UV-Blocking (senofilcon A) Soft Contact Lens Prevents UVA-induced Yellow Fluorescence and NADH loss in the Rabbit Lens Nucleus in vivo

    Science.gov (United States)

    Giblin, Frank J.; Lin, Li-Ren; Simpanya, Mukoma F.; Leverenz, Victor R.; Fick, Catherine E.

    2012-01-01

    It is known that fluorescence, much of it caused by UVA light excitation, increases in the aging human lens, resulting in loss of sharp vision. This study used an in vivo animal model to investigate UVA-excited fluorescence in the rabbit lens, which contains a high level of the UVA chromophore NADH, existing both free and bound to λ-crystallin. Also, the ability of a Class I (senofilcon A) soft contact lens to protect against UVA-induced effects on the rabbit lens was tested. Rabbit eyes were irradiated with UVA light in vivo (100 mW/cm2 on the cornea) for 1 hour using monochromatic 365 nm light. Irradiation was conducted in the presence of either a senofilcon A contact lens, a minimally UV-absorbing lotrafilcon A contact lens, or no contact lens at all. Eyes irradiated without a contact lens showed blue 365 nm-excited fluorescence initially, but this changed to intense yellow fluorescence after 1 hour. Isolated, previously irradiated lenses exhibited yellow fluorescence originating from the lens nucleus when viewed under 365 nm light, but showed normal blue fluorescence arising from the cortex. Previously irradiated lenses also exhibited a faint yellow color when observed under visible light. The senofilcon A contact lens protected completely against the UVA-induced effects on fluorescence and lens yellowing, whereas the lotrafilcon A lens showed no protection. The UVA-exposure also produced a 53% loss of total NADH (free plus bound) in the lens nucleus, with only a 13% drop in the anterior cortex. NADH loss in the nucleus was completely prevented with use of a senofilcon A contact lens, but no significant protection was observed with a lotrafilcon A lens. Overall, the senofilcon A lens provided an average of 67% protection against UVA-induced loss of four pyridine nucleotides in four different regions of the lens. HPLC analysis with fluorescence detection indicated a nearly six-fold increase in 365 nm-excited yellow fluorescence arising from lens nuclear

  2. Nanoimprint technology nanotransfer for thermoplastic and photocurable polymers

    CERN Document Server

    Taniguchi, Jun; Mizuno, Jun; Saito, Takushi

    2013-01-01

    Nanoscale pattern transfer technology using molds is a rapidly advancing area and one that has seen much recent attention due to its potential for use in nanotechnology industries and applications. However, because of these rapid advances, it can be difficult to keep up with the technological trends and the latest cutting-edge methods. In order to fully understand these pioneering technologies, a comprehensive understanding of the basic science and an overview of the techniques are required. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers covers

  3. Fabrication of a cost-effective polymer nanograting as a disposable plasmonic biosensor using nanoimprint lithography

    Science.gov (United States)

    Mohapatra, Saswat; Kumari, Sudha; Moirangthem, Rakesh S.

    2017-07-01

    A simple and cost-effective flexible plasmonic sensor is developed using a gold-coated polymer nanograting structure prepared via soft UV nanoimprint lithography. The sub-wavelength nanograting patterns of digital versatile discs were used as a template to prepare the polydimethylsiloxane stamp. The plasmonic sensing substrate was achieved after coating a gold thin film on top of the imprinted nanograting sample. The surface plasmon resonance (SPR) modes excited on the gold-coated nanograting structure appeared as a dip in the reflectance spectrum measured at normal incidence under white light illumination in the ambient air medium. Electromagnetic simulation based on the finite element method was carried out to analyze the excited SPR modes. The simulated result shows very close agreement with the experimental data. The performance of the sensor with respect to changing the surrounding dielectric medium yields a bulk refractive index sensitivity of 788  ±  21 nm per refractive index unit. Further, label-free detection of proteins using a plasmonic sensing substrate was demonstrated by monitoring specific interactions between bovine serum albumin (BSA) and anti-BSA proteins, which gave a detection limit of 123 pg mm-2 with respect to target anti-BSA protein binding. Thus, our proposed plasmonic sensor has potential for the development of an economical and highly sensitive label-free optical biosensing device for biomedical applications.

  4. Effect of nano-imprinting on open-circuit voltage of organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Emah, J.B.; Curry, R.J.; Silva, S.R.P. [Surrey Univ., Guildford (United Kingdom). Advanced Technology Inst.

    2010-07-01

    The open-circuit voltage (V{sub oc}) of solar cells with non-Ohmic contacts are determined by the work function difference of the electrodes. For Ohmic contacts the V{sub oc} is governed by the LUMO and HOMO levels of the acceptor and donor, respectively, which pin the Fermi levels of the cathode and anode. We present a case where the V{sub oc} of a single layer device using poly (3-hexylthiopene-2,5-diyl) (P3HT) as the photoactive material between a nanoimprinted poly poly (3,4-ethylenedioxythiophene) poly (styrene sulfonate)(PEDOT:PSS) and Al electrode decreases due to patterning. The reverse is shown to be the case when [6,6]-phenyl-C{sub 61}-butyric acid ester (PCBM) is introduced to form a bulk heterojunction (BHJ). In both scenarios, there is an increase in the short-circuit current, attributed to an extended optical path length within the photoactive layer and enhanced charge extraction through the increased surface area. The patterned BHJ devices show a 28% and 40% increase in the power conversion efficiency when imprinted with 727 nm and 340 nm periodic patterns respectively. ATR-FTIR investigations of the interfacial PEDOT:PSS film following patterning reveals the presence of PDMS residue which is supported by consideration of the effect on single layer P3HT and P3HT:PCBM blend device performance. UPS measurements demonstrate a reduction in the work function of the interfacial PEDOT:OSS layer by {proportional_to}0.5 eV following nanoimprinting which may originate from chemical modification by the PDMS residue or interfacial dipole formation. XPS spectrum of the imprinted PEDOT:PSS also shows a chemical shift in the 0(1s) core-level towards higher binding energy signifying interaction of the PDMS stamp residue with the PSS dominated surface of PEDOT:PSS. This led to significant improvement in the V{sub oc} and ultimately, the PCE. (orig.)

  5. Large area nanoimprint by substrate conformal imprint lithography (SCIL)

    Science.gov (United States)

    Verschuuren, Marc A.; Megens, Mischa; Ni, Yongfeng; van Sprang, Hans; Polman, Albert

    2017-06-01

    Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm2 to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3-4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.

  6. Optical characterisation of photonic wire and photonic crystal waveguides fabricated using nanoimprint lithography

    DEFF Research Database (Denmark)

    Borel, Peter Ingo; Frandsen, Lars Hagedorn; Lavrinenko, Andrei

    2006-01-01

    We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography.......We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography....

  7. Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography

    International Nuclear Information System (INIS)

    Alayo, Nerea; Bausells, Joan; Pérez-Murano, Francesc; Conde-Rubio, Ana; Labarta, Amilcar; Batlle, Xavier; Borrisé, Xavier

    2015-01-01

    Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition. (paper)

  8. Generic nano-imprint process for fabrication of nanowire arrays

    Energy Technology Data Exchange (ETDEWEB)

    Pierret, Aurelie; Hocevar, Moira; Algra, Rienk E; Timmering, Eugene C; Verschuuren, Marc A; Immink, George W G; Verheijen, Marcel A; Bakkers, Erik P A M [Philips Research Laboratories Eindhoven, High Tech Campus 11, 5656 AE Eindhoven (Netherlands); Diedenhofen, Silke L [FOM Institute for Atomic and Molecular Physics c/o Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); Vlieg, E, E-mail: e.p.a.m.bakkers@tue.nl [IMM, Solid State Chemistry, Radboud University Nijmegen, Heyendaalseweg 135, 6525 AJ Nijmegen (Netherlands)

    2010-02-10

    A generic process has been developed to grow nearly defect-free arrays of (heterostructured) InP and GaP nanowires. Soft nano-imprint lithography has been used to pattern gold particle arrays on full 2 inch substrates. After lift-off organic residues remain on the surface, which induce the growth of additional undesired nanowires. We show that cleaning of the samples before growth with piranha solution in combination with a thermal anneal at 550 deg. C for InP and 700 deg. C for GaP results in uniform nanowire arrays with 1% variation in nanowire length, and without undesired extra nanowires. Our chemical cleaning procedure is applicable to other lithographic techniques such as e-beam lithography, and therefore represents a generic process.

  9. Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography.

    Science.gov (United States)

    Alayo, Nerea; Conde-Rubio, Ana; Bausells, Joan; Borrisé, Xavier; Labarta, Amilcar; Batlle, Xavier; Pérez-Murano, Francesc

    2015-11-06

    Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition.

  10. A 3D-printed device for polymer nanoimprint lithography

    Science.gov (United States)

    Caño-García, Manuel; Geday, Morten A.; Gil-Valverde, Manuel; Megías Zarco, Antonio; Otón, José M.; Quintana, Xabier

    2018-02-01

    Nanoimprint lithography (NIL) is an imprinting technique which has experienced an increasing popularity due to its versatility in fabrication processes. Commercial NIL machines are readily available achieving high quality results; however, these machines involve a relatively high investment. Hence, small laboratories often choose to perform NIL copies in a more rudimentary and cheaper way. A new simple system is presented in this document. It is based on two devices which can be made in-house in plastic by using a 3D printer or in aluminum. Thus, the overall manufacturing complexity is vastly reduced. The presented system includes pressure control and potentially temperature control. Replicas have been made using a sawtooth grating master with a pitch around half micrometre. High quality patterns with low density of imperfections have been achieved in 2.25 cm2 surfaces. The material chosen for the negative intermediary mould is PDMS. Tests of the imprint have been performed using the commercial hybrid polymer Ormostamp®.

  11. Solid state microcavity dye lasers fabricated by nanoimprint lithography

    DEFF Research Database (Denmark)

    Nilsson, Daniel; Nielsen, Theodor; Kristensen, Anders

    2004-01-01

    propagating TE–TM modes. The laser cavity has the lateral shape of a trapezoid, supporting lasing modes by reflection on the vertical cavity walls. The solid polymer dye lasers emit laterally through one of the vertical cavity walls, when pumped optically through the top surface by means of a frequency...... doubled, pulsed Nd:YAG laser. Lasing in the wavelength region from 560 to 570 nm is observed from a laser with a side-length of 50 µm. In this proof of concept, the lasers are multimode with a mode wavelength separation of approximately 1.6 nm, as determined by the waveguide propagation constant......We present a solid state polymer microcavity dye laser, fabricated by thermal nanoimprint lithography (NIL) in a dye-doped thermoplast. The thermoplast poly-methylmethacrylate (PMMA) is used due to its high transparency in the visible range and its robustness to laser radiation. The laser dye...

  12. Uniformity across 200 mm silicon wafers printed by nanoimprint lithography

    International Nuclear Information System (INIS)

    Gourgon, C; Perret, C; Tallal, J; Lazzarino, F; Landis, S; Joubert, O; Pelzer, R

    2005-01-01

    Uniformity of the printing process is one of the key parameters of nanoimprint lithography. This technique has to be extended to large size wafers to be useful for several industrial applications, and the uniformity of micro and nanostructures has to be guaranteed on large surfaces. This paper presents results of printing on 200 mm diameter wafers. The residual thickness uniformity after printing is demonstrated at the wafer scale in large patterns (100 μm), in smaller lines of 250 nm and in sub-100 nm features. We show that a mould deformation occurs during the printing process, and that this deformation is needed to guarantee printing uniformity. However, the mould deformation is also responsible for the potential degradation of the patterns

  13. Effect of surface tension and coefficient of thermal expansion in 30 nm scale nanoimprinting with two flexible polymer molds

    International Nuclear Information System (INIS)

    Kim, Jae Kwan; Cho, Hye Sung; Jung, Ho-Sup; Suh, Kahp-Yang; Lim, Kipil; Kim, Ki-Bum; Choi, Dae-Geun; Jeong, Jun-Ho

    2012-01-01

    We report on nanoimprinting of polymer thin films at 30 nm scale resolution using two types of ultraviolet (UV)-curable, flexible polymer molds: perfluoropolyether (PFPE) and polyurethane acrylate (PUA). It was found that the quality of nanopatterning at the 30 nm scale is largely determined by the combined effects of surface tension and the coefficient of thermal expansion of the polymer mold. In particular, the polar component of surface tension may play a critical role in clean release of the mold, as evidenced by much reduced delamination or broken structures for the less polarized PFPE mold when patterning a relatively hydrophilic PMMA film. In contrast, such problems were not notably observed with a relatively hydrophobic PS film for both polymer molds. In addition, the demolding characteristic was also influenced by the coefficient of thermal expansion so that no delamination or uniformity problems were observed when patterning a UV-curable polymer film at room temperature. These results suggest that a proper polymeric mold material needs to be chosen for patterning polymer films under different surface properties and processing conditions, providing insights into how a clean demolding characteristic can be obtained at 30 nm scale nanopatterning. (paper)

  14. Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

    Science.gov (United States)

    Matsuoka, Yoichi; Seki, Junichi; Nakayama, Takahiro; Nakagawa, Kazuki; Azuma, Hisanobu; Yamamoto, Kiyohito; Sato, Chiaki; Sakai, Fumio; Takabayashi, Yukio; Aghili, Ali; Mizuno, Makoto; Choi, Jin; Jones, Chris E.

    2016-10-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

  15. Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

    KAUST Repository

    Lee, Daeho

    2012-08-10

    Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.

  16. An assessment of the process capabilities of nanoimprint lithography

    Science.gov (United States)

    Balla, Tobias; Spearing, S. Mark; Monk, Andrew

    2008-09-01

    Nanoimprint lithography (NIL) is an emerging nanofabrication tool, able to replicate imprint patterns quickly and at high volumes. The present study was performed in order to define the capabilities of NIL, based on a study of published research and to identify the application areas where NIL has the greatest potential. The process attributes of different NIL process chains were analysed, and their process capabilities were compared to identify trends and process limitations. The attributes chosen include the line width, relief height, initial resist thickness, residual layer thickness, imprint area and line width tolerances. In each case well-defined limits can be identified, which are a direct result of the mechanisms involved in the NIL process. These quantitative results were compared with the assessments of individuals in academia and within the microfabrication industry. The results suggest NIL is most suited to producing photonic, microfluidic and patterned media applications, with photonic applications the closest to market. NIL needs to address overlay alignment issues for wider use, while an analysis is needed for each market, as to whether NIL adds value.

  17. Multifunctional guest-host particles engineered by reversal nanoimprint lithography

    Science.gov (United States)

    Ha, Uh-Myong; Kaban, Burhan; Tomita, Andreea; Krekić, Kristijan; Klintuch, Dieter; Pietschnig, Rudolf; Ehresmann, Arno; Holzinger, Dennis; Hillmer, Hartmut

    2018-03-01

    Particulate polymeric microfibers with incorporated europium(III)oxide (Eu2O3) nanoparticles were introduced as a magneto-photoluminescent multifunctional material fabricated via reversal nanoimprint lithography. To specifically address the volume properties of these guest-host particles, the guest, Eu2O3, was milled down to an average particle size of 350 nm in diameter and mixed with the host-polymer, AMONIL®, before in situ hardening in the imprint stamp. The variation of the fabrication process parameters, i.e. delay time, spin coating speed, as well as the concentration of Eu2O3 nanoparticles was proven to have a significant impact on both the structure quality and the stamp release of the microfibers with respect to the formation of a thinner residual layer. Structural characterization performed by SEM revealed optimum fabrication process parameters for a homogeneous spatial distribution of Eu2O3 nanoparticles within the microfibers while simultaneously avoiding the formation of undesired agglomerates. The magneto-photoluminescent properties of Eu2O3 nanoparticles, i.e. a red emission at 613 nm and a paramagnetic response, were found to be superimposed to the optic and the diamagnetic behaviors of AMONIL®. The results imply that guest-host interdependence of these properties can be excluded and that the suggested technique enables for specific tailoring of particulate multifunctional materials with focus on their volume properties.

  18. Study of nanoimprint lithography (NIL) for HVM of memory devices

    Science.gov (United States)

    Kono, Takuya; Hatano, Masayuki; Tokue, Hiroshi; Kobayashi, Kei; Suzuki, Masato; Fukuhara, Kazuya; Asano, Masafumi; Nakasugi, Tetsuro; Choi, Eun Hyuk; Jung, Wooyung

    2017-03-01

    A low cost alternative lithographic technology is desired to meet the decreasing feature size of semiconductor devices. Nano-imprint lithography (NIL) is one of the candidates for alternative lithographic technologies.[1][2][3] NIL has such advantages as good resolution, critical dimension (CD) uniformity and low line edge roughness (LER). On the other hand, the critical issues of NIL are defectivity, overlay, and throughput. In order to introduce NIL into the HVM, it is necessary to overcome these three challenges simultaneously.[4]-[12] In our previous study, we have reported a dramatic improvement in NIL process defectivity on a pilot line tool, FPA-1100 NZ2. We have described that the NIL process for 2x nm half pitch is getting closer to the target of HVM.[12] In this study, we report the recent evaluation of the NIL process performance to judge the applicability of NIL to memory device fabrications. In detail, the CD uniformity and LER are found to be less than 2nm. The overlay accuracy of the test device is less than 7nm. A defectivity level of below 1pcs./cm2 has been achieved at a throughput of 15 wafers per hour.

  19. Fabrication of sub-wavelength photonic structures by nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Kontio, J.

    2013-11-01

    Nanoimprint lithography (NIL) is a novel but already a mature lithography technique. In this thesis it is applied to the fabrication of nanophotonic devices using its main advantage: the fast production of sub-micron features in high volume in a cost-effective way. In this thesis, fabrication methods for conical metal structures for plasmonic applications and sub-wavelength grating based broad-band mirrors are presented. Conical metal structures, nanocones, with plasmonic properties are interesting because they enable concentrating the energy of light in very tight spots resulting in very high local intensities of electromagnetic energy. The nanocone formation process is studied with several metals. Enhanced second harmonic generation using gold nanocones is presented. Bridged-nanocones are used to enhance Raman scattering from a dye solution. The sub-wavelength grating mirror is an interesting structure for photonics because it is very simple to fabricate and its reflectivity can be extended to the far infrared wavelength range. It also has polarization dependent properties which are used in this thesis to stabilize the output beam of infrared semiconductor disk laser. NIL is shown to be useful a technique in the fabrication of nanophotonic devices in the novel and rapidly growing field of plasmonics and also in more traditional, but still developing, semiconductor laser applications (orig.)

  20. Nanoimprint lithography of light trapping patterns in sol-gel coatings for thin film silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Heijna, M.; Loffler, J.; Van Aken, B.B.; Soppe, W.J. [ECN Solar Energy, Petten (Netherlands); Borg, H.; Peeters, P. [OM and T, Eindhoven (Netherlands)

    2008-04-15

    For thin-film silicon solar cells, light trapping schemes are of uppermost importance to harvest all available sunlight. Typically, randomly textured TCO front layers are used to scatter the light diffusively in p-i-n cells on glass. Here, we investigate methods to texture the back contact with both random and periodic textures, for use in n-i-p cells on opaque foil. We applied an electrically insulating SiOx-polymer coating on a stainless steel substrate, and textured this barrier layer by nanoimprint. On this barrier layer the back contact is deposited for further use in the solar cell stack. Replication of masters with various random and periodic patterns was tested, and, using scanning electron microscopy, replicas were found to compare well with the originals. Masters with U-grooves of various sub micrometer widths have been used to investigate the optimal dimensions of regular patterns for light trapping in the silicon layers. Angular reflection distributions were measured to evaluate the light scattering properties of both periodic and random patterns. Diffraction gratings show promising results in scattering the light to specific angles, enhancing the total internal reflection in the solar cell.

  1. Advanced nanoimprint patterning for functional electronics and biochemical sensing

    Science.gov (United States)

    Wang, Chao

    Nano-fabrication has been widely used for a variety of disciplines, including electronics, material science, nano-optics, and nano-biotechnology. This dissertation focuses on nanoimprint lithography (NIL) based novel nano-patterning techniques for fabricating functional structures, and discusses their applications in advanced electronics and high-sensitivity molecular sensing. In this dissertation, examples of using nano-fabricated structures for promising electronic applications are presented. For instance, 10 nm and 18 nm features are NIL-fabricated for Si/SiGe heterojunction tunneling transistors and graphene nano-ribbon transistors, using shadow evaporation and line-width shrinking techniques, respectively. An ultrafast laser melting based method is applied on flexible plastic substrates to correct defects of nano-features. Nano-texturing of sapphire substrate is developed to improve the light extraction of GaN light emitting diodes (LEDs) by 70 %. A novel multi-layer nano-patterned Si-mediated catalyst is discovered to grow straight and uniform Si nanowires with optimized properties in size, location, and crystallization on amorphous SiO2 substrate. Nano-structures are also functionalized into highly sensitive bio-chemical sensors. Plasmonic nano-bar antenna arrays are demonstrated to effectively sense infrared molecules >10 times better than conventional plasmonic sensors. As small as 20 nm wide nano-channel fluidic devices are developed to linearize and detect DNA molecules for potential DNA sequencing. An integrated fluidic system is built to incorporate plasmonic nano-structures for 30X-enhanced fluorescence detection of large DNA molecules.

  2. Silicon oxide nanoimprint stamp fabrication by edge lithography reinforced with silicon nitride

    NARCIS (Netherlands)

    Zhao, Yiping; Berenschot, Johan W.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt

    2007-01-01

    The fabrication of silicon oxide nanoimprint stamp employing edge lithography in combination with silicon nitride deposition is presented. The fabrication process is based on conventional photolithography an weg etching methods. Nanoridges with width dimension of sub-20 nm were fabricated by edge

  3. Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

    NARCIS (Netherlands)

    Zhao, Yiping; Berenschot, Johan W.; de Boer, M.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt

    2008-01-01

    The fabrication of a stamp reinforced with silicon nitride is presented for its use in nanoimprint lithography. The fabrication process is based on edge lithography using conventional optical lithography and wet anisotropic etching of 110 silicon wafers. SiO2 nano-ridges of 20 nm in width were

  4. Hot embossing holographic images in BOPP shrink films through large-area roll-to-roll nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Menglin; Lin, Shiwei, E-mail: linsw@hainu.edu.cn; Jiang, Wenkai; Pan, Nengqian

    2014-08-30

    Highlights: • High-quality holographic images were replicated in large-area shrink film. • Surface morphology evolution was analyzed in films embossed at different temperatures. • Optical, mechanical, and thermal characteristics were systematically analyzed. - Abstract: Diffraction grating-based holographic images have been successfully replicated in biaxially oriented polypropylene (BOPP) shrink films through large-area roll-to-roll nanoimprint technique. Such hot embossing of holographic images on BOPP films represents a promising means of creating novel security features in packaging applications. The major limitation of the high-quality replication is the relatively large thermal shrinkage of BOPP shrink film. However, although an appropriate shrinkage is demanded after embossing, over-shrinking not only causes distortion in embossed images, but also reduces the various properties of BOPP shrink films mainly due to the disappearance of orientation. The effects of embossing temperature on the mechanical, thermal and optical properties as well as polymer surface morphologies were systematically analyzed. The results show that the optimal process parameters are listed as follows: the embossing temperature at 104–110 °C, embossing force 6 kg/cm{sup 2} and film speed 32 m/min. The variation in flow behavior of polymer surface during hot embossing process is highly dependent on the temperature. In addition, the adhesion from the direct contact between the rubber press roller and polymer surfaces is suggested to cause the serious optical properties failure.

  5. Physically transient photonics: random versus distributed feedback lasing based on nanoimprinted DNA.

    Science.gov (United States)

    Camposeo, Andrea; Del Carro, Pompilio; Persano, Luana; Cyprych, Konrad; Szukalski, Adam; Sznitko, Lech; Mysliwiec, Jaroslaw; Pisignano, Dario

    2014-10-28

    Room-temperature nanoimprinted, DNA-based distributed feedback (DFB) laser operation at 605 nm is reported. The laser is made of a pure DNA host matrix doped with gain dyes. At high excitation densities, the emission of the untextured dye-doped DNA films is characterized by a broad emission peak with an overall line width of 12 nm and superimposed narrow peaks, characteristic of random lasing. Moreover, direct patterning of the DNA films is demonstrated with a resolution down to 100 nm, enabling the realization of both surface-emitting and edge-emitting DFB lasers with a typical line width of <0.3 nm. The resulting emission is polarized, with a ratio between the TE- and TM-polarized intensities exceeding 30. In addition, the nanopatterned devices dissolve in water within less than 2 min. These results demonstrate the possibility of realizing various physically transient nanophotonics and laser architectures, including random lasing and nanoimprinted devices, based on natural biopolymers.

  6. Improving information density in ferroelectric polymer films by using nanoimprinted gratings

    Science.gov (United States)

    Martínez-Tong, Daniel E.; Soccio, Michela; Rueda, Daniel R.; Nogales, Aurora; García-Gutiérrez, Mari Cruz; Ezquerra, Tiberio A.

    2015-03-01

    The development of polymer non-volatile memories depends on the effective fabrication of devices with high density of information. Well-defined low aspect ratio nanogratings on thin films of poly(vinylidene fluoride-trifluoroethylene) copolymers can be fabricated by using Nanoimprint Lithography (NIL). By using these nanogratings, an improved management of writing and reading information can be reached as revealed by Piezoresponse Force Microscopy (PFM). Structural investigation by means of Grazing Incidence X-ray (GIX) scattering techniques indicates that the physical confinement generated by nanoimprint promotes the development of smaller and edge-on oriented crystals. Our results evidence that one-dimensional nanostructuring can be a straightforward approach to improve the control of the polarization in ferroelectric polymer thin films.

  7. The fabrication of nanopatterns with Au nanoparticles-embedded micelles via nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jung-Pil; Kim, Eun-Uk; Koh, Haeng-Deog; Kang, Nam-Goo; Jung, Gun-Young; Lee, Jae-Suk, E-mail: gyjung@gist.ac.k, E-mail: jslee@gist.ac.k [Department of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro (Oryong-dong), Buk-gu Gwangju 500-712 (Korea, Republic of)

    2009-09-09

    We fabricated nanopatterns with Au nanoparticles-embedded micelles (Au-micelles) by self-assembly of block copolymers via nanoimprint lithography. The micelle structure prepared by self-assembled block copolymers was used as a template for the synthesis of Au nanoparticles (Au NPs). Au NPs were synthesized in situ inside the micelles of polystyrene-block-poly(2-vinylpyridine) (PS- b-P2VP). Au-micelles were arranged on the trenches of the polymer template, which was imprinted by nanoimprint lithography. The fabrication of line-type and dot-type nanopatterns was carried out by the combined method. In addition, multilayer nanopatterns of the Au-micelles were also proposed.

  8. Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Xiuguo; Ma, Zhichao; Xu, Zhimou [Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhang, Chuanwei; Jiang, Hao [State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China); Liu, Shiyuan, E-mail: shyliu@mail.hust.edu.cn [Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China)

    2014-11-21

    Mueller matrix ellipsometry (MME) is applied to detect foot-like asymmetry encountered in nanoimprint lithography (NIL) processes. We present both theoretical and experimental results which show that MME has good sensitivity to both the magnitude and direction of asymmetric profiles. The physics behind the use of MME for asymmetry detection is the breaking of electromagnetic reciprocity theorem for the zeroth-order diffraction of asymmetric gratings. We demonstrate that accurate characterization of asymmetric nanoimprinted gratings can be achieved by performing MME measurements in a conical mounting with the plane of incidence parallel to grating lines and meanwhile incorporating depolarization effects into the optical model. The comparison of MME-extracted asymmetric profile with the measurement by cross-sectional scanning electron microscopy also reveals the strong potential of this technique for in-line monitoring NIL processes, where symmetric structures are desired.

  9. Direct nanoimprint lithography of Al2O3 using a chelated monomer-based precursor

    International Nuclear Information System (INIS)

    Ganesan, Ramakrishnan; Dinachali, Saman Safari; Lim, Su Hui; Saifullah, M S M; He, Chaobin; Low, Hong Yee; Chong, Wee Tit; Lim, Andrew H H; Yong, Jin Jie; Thian, Eng San

    2012-01-01

    Nanostructuring of Al 2 O 3 is predominantly achieved by the anodization of aluminum film and is limited to obtaining porous anodized aluminum oxide (AAO). One of the main restrictions in developing approaches for direct fabrication of various types of Al 2 O 3 patterns, such as lines, pillars, holes, etc, is the lack of a processable aluminum-containing resist. In this paper, we demonstrate a stable precursor prepared by reacting aluminum tri-sec-butoxide with 2-(methacryloyloxy)ethyl acetoacetate, a chelating monomer, which can be used for large area direct nanoimprint lithography of Al 2 O 3 . Chelation in the precursor makes it stable against hydrolysis whilst the presence of a reactive methacrylate group renders it polymerizable. The precursor was mixed with a cross-linker and their in situ thermal free-radical co-polymerization during nanoimprinting rigidly shaped the patterns, trapped the metal atoms, reduced the surface energy and strengthened the structures, thereby giving a ∼100% yield after demolding. The imprinted structures were heat-treated, leading to the loss of organics and their subsequent shrinkage. Amorphous Al 2 O 3 patterns with line-widths as small as 17 nm were obtained. Our process utilizes the advantages of sol–gel and methacrylate routes for imprinting and at the same time alleviates the disadvantages associated with both these methods. With these benefits, the chelating monomer route may be the harbinger of the universal scheme for direct nanoimprinting of metal oxides. (paper)

  10. Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography

    International Nuclear Information System (INIS)

    Song, Jingfeng; Lu, Haidong; Gruverman, Alexei; Ducharme, Stephen; Li, Shumin; Tan, Li

    2016-01-01

    Conventional nanoimprint lithography with expensive rigid molds is used to pattern ferroelectric polymer nanostructures on hard substrate for use in, e.g., organic electronics. The main innovation here is the use of inexpensive soft polycarbonate molds derived from recordable DVDs and reverse nanoimprint lithography at low pressure, which is compatible with flexible substrates. This approach was implemented to produce regular stripe arrays with a spacing of 700 nm from vinylidene fluoride co trifluoroethylene ferroelectric copolymer on flexible polyethylene terephthalate substrates. The nanostructures have very stable and switchable piezoelectric response and good crystallinity, and are highly promising for use in organic electronics enhanced or complemented by the unique properties of the ferroelectric polymer, such as bistable polarization, piezoelectric response, pyroelectric response, or electrocaloric function. The soft-mold reverse nanoimprint lithography also leaves little or no residual layer, affording good isolation of the nanostructures. This approach reduces the cost and facilitates large-area, high-throughput production of isolated functional polymer nanostructures on flexible substrates for the increasing application of ferroelectric polymers in flexible electronics. (paper)

  11. Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography.

    Science.gov (United States)

    Song, Jingfeng; Lu, Haidong; Li, Shumin; Tan, Li; Gruverman, Alexei; Ducharme, Stephen

    2016-01-08

    Conventional nanoimprint lithography with expensive rigid molds is used to pattern ferroelectric polymer nanostructures on hard substrate for use in, e.g., organic electronics. The main innovation here is the use of inexpensive soft polycarbonate molds derived from recordable DVDs and reverse nanoimprint lithography at low pressure, which is compatible with flexible substrates. This approach was implemented to produce regular stripe arrays with a spacing of 700 nm from vinylidene fluoride co trifluoroethylene ferroelectric copolymer on flexible polyethylene terephthalate substrates. The nanostructures have very stable and switchable piezoelectric response and good crystallinity, and are highly promising for use in organic electronics enhanced or complemented by the unique properties of the ferroelectric polymer, such as bistable polarization, piezoelectric response, pyroelectric response, or electrocaloric function. The soft-mold reverse nanoimprint lithography also leaves little or no residual layer, affording good isolation of the nanostructures. This approach reduces the cost and facilitates large-area, high-throughput production of isolated functional polymer nanostructures on flexible substrates for the increasing application of ferroelectric polymers in flexible electronics.

  12. Self-aligned metallization on organic semiconductor through 3D dual-layer thermal nanoimprint

    International Nuclear Information System (INIS)

    Jung, Y; Cheng, X

    2014-01-01

    High-resolution patterning of metal structures on organic semiconductors is important to the realization of high-performance organic transistors for organic integrated circuit applications. The traditional shadow mask technique has a limited resolution, precluding sub-micron metal structures on organic semiconductors. Thus organic transistors cannot benefit from scaling into the deep sub-micron region to improve their dc and ac performances. In this work, we report an efficient multiple-level metallization on poly (3-hexylthiophene) (P3HT) with a deep sub-micron lateral gap. By using a 3D nanoimprint mold in a dual-layer thermal nanoimprint process, we achieved self-aligned two-level metallization on P3HT. The 3D dual-layer thermal nanoimprint enables the first metal patterns to have suspending side-wings that can clearly define a distance from the second metal patterns. Isotropic and anisotropic side-wing structures can be fabricated through two different schemes. The process based on isotropic side-wings achieves a lateral-gap in the order of 100 nm (scheme 1). A gap of 60 nm can be achieved from the process with anisotropic side-wings (scheme 2). Because of the capability of nanoscale metal patterning on organic semiconductors with high overlay accuracy, this self-aligned metallization technique can be utilized to fabricate high-performance organic metal semiconductor field-effect transistor. (paper)

  13. A Class I UV-blocking (senofilcon A) soft contact lens prevents UVA-induced yellow fluorescence and NADH loss in the rabbit lens nucleus in vivo.

    Science.gov (United States)

    Giblin, Frank J; Lin, Li-Ren; Simpanya, Mukoma F; Leverenz, Victor R; Fick, Catherine E

    2012-09-01

    It is known that fluorescence, much of it caused by UVA light excitation, increases in the aging human lens, resulting in loss of sharp vision. This study used an in vivo animal model to investigate UVA-excited fluorescence in the rabbit lens, which contains a high level of the UVA chromophore NADH, existing both free and bound to λ-crystallin. Also, the ability of a Class I (senofilcon A) soft contact lens to protect against UVA-induced effects on the rabbit lens was tested. Rabbit eyes were irradiated with UVA light in vivo (100 mW/cm(2) on the cornea) for 1 h using monochromatic 365 nm light. Irradiation was conducted in the presence of either a senofilcon A contact lens, a minimally UV-absorbing lotrafilcon A contact lens, or no contact lens at all. Eyes irradiated without a contact lens showed blue 365 nm-excited fluorescence initially, but this changed to intense yellow fluorescence after 1 h. Isolated, previously irradiated lenses exhibited yellow fluorescence originating from the lens nucleus when viewed under 365 nm light, but showed normal blue fluorescence arising from the cortex. Previously irradiated lenses also exhibited a faint yellow color when observed under visible light. The senofilcon A contact lens protected completely against the UVA-induced effects on fluorescence and lens yellowing, whereas the lotrafilcon A lens showed no protection. The UVA-exposure also produced a 53% loss of total NADH (free plus bound) in the lens nucleus, with only a 13% drop in the anterior cortex. NADH loss in the nucleus was completely prevented with use of a senofilcon A contact lens, but no significant protection was observed with a lotrafilcon A lens. Overall, the senofilcon A lens provided an average of 67% protection against UVA-induced loss of four pyridine nucleotides in four different regions of the lens. HPLC analysis with fluorescence detection indicated a nearly six-fold increase in 365 nm-excited yellow fluorescence arising from lens nuclear

  14. Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching

    Directory of Open Access Journals (Sweden)

    Yu Yabiku

    2013-10-01

    Full Text Available We applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns.

  15. Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching

    KAUST Repository

    Yabiku, Y.

    2013-10-22

    We applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns. 2013 Author(s).

  16. Nanoimprinted polymer chips for light induced local heating of liquids in micro- and nanochannels

    DEFF Research Database (Denmark)

    Thamdrup, Lasse Højlund; Pedersen, Jonas Nyvold; Flyvbjerg, Henrik

    2010-01-01

    A nanoimprinted polymer chip with a thin near-infrared absorber layer that enables light-induced local heating (LILH) of liquids inside micro- and nanochannels is presented. An infrared laser spot and corresponding hot-spot could be scanned across the device. Large temperature gradients yield...... a 785 nm laser diode was focused from the backside of the chip to a spot diameter down to 5 ..m in the absorber layer, yielding a localized heating (Gaussian profile) and large temperature gradients in the liquid in the nanochannels. A laser power of 38 mW yielded a temperature of 40°C in the center...

  17. Optimization of micro and nanoimprint de-embossing by elastic fracture modelling

    OpenAIRE

    Balla, Tobias; Spearing, Simon Mark

    2013-01-01

    A semi-analytical model is presented for the de-embossing phase of the nanoimprint patterning process. The model is based on established principles of elastic fracture mechanics as developed for fibre-bridged cracking in composites. De-embossing is idealized as a steady-state fracture process, which enables the energy change to be considered by reference to a unit cell of a cylindrical polymer post, de-embossing from an axisymmetric stamp. The model provides predictions of the achievable limi...

  18. A compact system for large-area thermal nanoimprint lithography using smart stamps

    DEFF Research Database (Denmark)

    Pedersen, Rasmus Haugstrup; Hansen, Ole; Kristensen, Anders

    2008-01-01

    We present a simple apparatus for thermal nanoimprint lithography. In this work, the stamp is designed to significantly reduce the requirements for pressure application on the external imprint system. By MEMS-based processing, an air cavity inside the stamp is created, and the required pressure...... for successful imprint is reduced. Additionally, the stamp is capable of performing controlled demolding after imprint. Due to the complexity of the stamp, a compact and cost-effective imprint apparatus can be constructed. The design and fabrication of the advanced stamp as well as the simple imprint equipment...

  19. Nanomanipulation of 2 inch wafer fabrication of vertically aligned carbon nanotube arrays by nanoimprint lithography

    DEFF Research Database (Denmark)

    Bu, Ian Y. Y.; Eichhorn, Volkmar; Carlson, Kenneth

    2011-01-01

    Carbon nanotube (CNT) arrays are typically defined by electron beam lithography (EBL), and hence limited to small areas due to the low throughput. To obtain wafer‐scale fabrication we propose large area thermal nanoimprint lithography (NIL). A 2‐inch stamp master is defined using EBL for subsequent......, efficient production of wafer‐scale/larger arrays of CNTs has been achieved. The CNTs have been deposited by wafer‐scale plasma enhanced chemical vapour deposition (PECVD) of C2H2/NH3. Substrates containing such nanotubes have been used to automate nanorobotic manipulation sequences of individual CNTs...

  20. DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates

    DEFF Research Database (Denmark)

    Smistrup, K.; Nørregaard, J.; Mironov, A.

    2013-01-01

    by including a lambda quarter shift at the center of the grating. The need for phase shifts and multiple wavelengths eliminates some lithography methods such as holography. Typically, these lasers are produced by e-beam lithography (EBL). We present a production method based on thermal nanoimprint lithography...... during the imprint process and the narrow temperature window for imprint and separation (80°C and 55°C) ensures minimal issues with thermal mismatch between the InP substrate and the Si stamp. The imprinted InP wafers were processed in NeoPhotonics standard process line to create working lasers...

  1. Resistless Fabrication of Nanoimprint Lithography (NIL Stamps Using Nano-Stencil Lithography

    Directory of Open Access Journals (Sweden)

    Juergen Brugger

    2013-10-01

    Full Text Available In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.

  2. A poly(dimethylsiloxane)-coated flexible mold for nanoimprint lithography

    International Nuclear Information System (INIS)

    Lee, Nae Yoon; Kim, Youn Sang

    2007-01-01

    In this paper, we introduce an anti-adhesion poly(dimethylsiloxane) (PDMS)-coated flexible mold and its applications for room-temperature imprint lithography. The flexible mold is fabricated using an ultraviolet-curable prepolymer on a flexible substrate, and its surface is passivated with a thin layer of PDMS to impart an anti-adhesion property. The highly flexible mold enables conformal contact with a substrate on which a low-viscosity polymer resist is spin-cast in a thin layer. Large-area imprinting is then realized at room temperature under significantly reduced pressure. The mold was durable even after repetitive imprinting of over 200 times. Also, we show a double imprinting on the substrate with a PDMS-coated replica polymeric mold having 500 nm line patterns. This enables the formation of matrix patterns with varying feature heights in less than 7 min

  3. Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity

    DEFF Research Database (Denmark)

    Taylor, Hayden; Smistrup, Kristian; Boning, Duane

    2011-01-01

    We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations...

  4. Fabrication and nano-imprintabilities of Zr-, Pd- and Cu-based glassy alloy thin films

    International Nuclear Information System (INIS)

    Takenaka, Kana; Saidoh, Noriko; Nishiyama, Nobuyuki; Inoue, Akihisa

    2011-01-01

    With the aim of investigating nano-imprintability of glassy alloys in a film form, Zr 49 Al 11 Ni 8 Cu 32 , Pd 39 Cu 29 Ni 13 P 19 and Cu 38 Zr 47 Al 9 Ag 6 glassy alloy thin films were fabricated on Si substrate by a magnetron sputtering method. These films exhibit a very smooth surface, a distinct glass transition phenomenon and a large supercooled liquid region of about 80 K, which are suitable for imprinting materials. Moreover, thermal nano-imprintability of these obtained films is demonstrated by using a dot array mold with a dot diameter of 90 nm. Surface observations revealed that periodic nano-hole arrays with a hole diameter of 90 nm were successfully imprinted on the surface of these films. Among them, Pd-based glassy alloy thin film indicated more precise pattern imprintability, namely, flatter residual surface plane and sharper hole edge. It is said that these glassy alloy thin films, especially Pd-based glassy alloy thin film, are one of the promising materials for fabricating micro-machines and nano-devices by thermal imprinting.

  5. Toward a nanoimprinted nanoantenna to perform optical rectification through molecular diodes

    Science.gov (United States)

    Reynaud, C. A.; Duché, D.; Ruiz, C. M.; Palanchoke, U.; Patrone, L.; Le Rouzo, J.; Labau, S.; Frolet, N.; Gourgon, C.; Alfonso, C.; Charaï, A.; Lebouin, C.; Simon, J.-J.; Escoubas, L.

    2017-12-01

    This work presents investigations about the realization and modelization of rectenna solar cells. Rectennas are antennas coupled with a rectifier to convert the alternative current originating from the antenna into direct current that can be harvested and stored. By reducing the size of the antennas to the nanoscale, interactions with visible and near-infrared light become possible. If techniques such as nanoimprint lithography make possible the fabrication of sufficiently small plasmonic structures to act as optical antennas, the concept of rectenna still faces several challenges. One of the most critical point is to achieve rectification at optical frequencies. To address this matter, we propose to use molecular diodes (ferrocenyl-alkanethiol) that can be self-assembled on metallic surfaces such as gold or silver. In this paper, we present a basic rectenna theory as well as finite-difference time-domain (FDTD) optical simulations of plasmonic structures and experimental results of both nanoimprint fabrication of samples and characterizations by electron microscopy, Raman spectroscopy, and cyclic voltammetry techniques.

  6. Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine.

    Science.gov (United States)

    Greer, Andrew Im; Della-Rosa, Benoit; Khokhar, Ali Z; Gadegaard, Nikolaj

    2016-12-01

    The conversion of a computer numerical control machine into a nanoimprint step-and-repeat tool with additional laser- and photolithography capacity is documented here. All three processes, each demonstrated on a variety of photoresists, are performed successfully and analysed so as to enable the reader to relate their known lithography process(es) to the findings. Using the converted tool, 1 cm(2) of nanopattern may be exposed in 6 s, over 3300 times faster than the electron beam equivalent. Nanoimprint tools are commercially available, but these can cost around 1000 times more than this customised computer numerical control (CNC) machine. The converted equipment facilitates rapid production and large area micro- and nanoscale research on small grants, ultimately enabling faster and more diverse growth in this field of science. In comparison to commercial tools, this converted CNC also boasts capacity to handle larger substrates, temperature control and active force control, up to ten times more curing dose and compactness. Actual devices are fabricated using the machine including an expanded nanotopographic array and microfluidic PDMS Y-channel mixers.

  7. High throughput nanoimprint lithography for semiconductor memory applications

    Science.gov (United States)

    Ye, Zhengmao; Zhang, Wei; Khusnatdinov, Niyaz; Stachowiak, Tim; Irving, J. W.; Longsine, Whitney; Traub, Matthew; Fletcher, Brian; Liu, Weijun

    2017-03-01

    Imprint lithography is a promising technology for replication of nano-scale features. For semiconductor device applications, Canon deposits a low viscosity resist on a field by field basis using jetting technology. A patterned mask is lowered into the resist fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are two critical components to meeting throughput requirements for imprint lithography. Using a similar approach to what is already done for many deposition and etch processes, imprint stations can be clustered to enhance throughput. The FPA-1200NZ2C is a four station cluster system designed for high volume manufacturing. For a single station, throughput includes overhead, resist dispense, resist fill time (or spread time), exposure and separation. Resist exposure time and mask/wafer separation are well understood processing steps with typical durations on the order of 0.10 to 0.20 seconds. To achieve a total process throughput of 17 wafers per hour (wph) for a single station, it is necessary to complete the fluid fill step in 1.2 seconds. For a throughput of 20 wph, fill time must be reduced to only one 1.1 seconds. There are several parameters that can impact resist filling. Key parameters include resist drop volume (smaller is better), system controls (which address drop spreading after jetting), Design for Imprint or DFI (to accelerate drop spreading) and material engineering (to promote wetting between the resist and underlying adhesion layer). In addition, it is mandatory to maintain fast filling, even for edge field imprinting. In this paper, we address the improvements made in all of these parameters to first enable a 1.20 second filling process for a device like pattern and have demonstrated this capability for both full fields and edge fields. Non

  8. Optimization of droplets for UV-NIL using coarse-grain simulation of resist flow

    Science.gov (United States)

    Sirotkin, Vadim; Svintsov, Alexander; Zaitsev, Sergey

    2009-03-01

    A mathematical model and numerical method are described, which make it possible to simulate ultraviolet ("step and flash") nanoimprint lithography (UV-NIL) process adequately even using standard Personal Computers. The model is derived from 3D Navier-Stokes equations with the understanding that the resist motion is largely directed along the substrate surface and characterized by ultra-low values of the Reynolds number. By the numerical approximation of the model, a special finite difference method is applied (a coarse-grain method). A coarse-grain modeling tool for detailed analysis of resist spreading in UV-NIL at the structure-scale level is tested. The obtained results demonstrate the high ability of the tool to calculate optimal dispensing for given stamp design and process parameters. This dispensing provides uniform filled areas and a homogeneous residual layer thickness in UV-NIL.

  9. Language Contact.

    Science.gov (United States)

    Nelde, Peter Hans

    1995-01-01

    Examines the phenomenon of language contact and recent trends in linguistic contact research, which focuses on language use, language users, and language spheres. Also discusses the role of linguistic and cultural conflicts in language contact situations. (13 references) (MDM)

  10. Novel magnetic wire fabrication process by way of nanoimprint lithography for current induced magnetization switching

    Directory of Open Access Journals (Sweden)

    Tsukasa Asari

    2017-05-01

    Full Text Available Nanoimprint lithography (NIL is an effective method to fabricate nanowire because it does not need expensive systems and this process is easier than conventional processes. In this letter, we report the Current Induced Magnetization Switching (CIMS in perpendicularly magnetized Tb-Co alloy nanowire fabricated by NIL. The CIMS in Tb-Co alloy wire was observed by using current pulse under in-plane external magnetic field (HL. We successfully observed the CIMS in Tb-Co wire fabricated by NIL. Additionally, we found that the critical current density (Jc for the CIMS in the Tb-Co wire fabricated by NIL is 4 times smaller than that fabricated by conventional lift-off process under HL = 200Oe. These results indicate that the NIL is effective method for the CIMS.

  11. Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

    Directory of Open Access Journals (Sweden)

    Sun-Kyu Lee

    2017-05-01

    Full Text Available We propose a nanofabrication process to generate large-area arrays of noble metal nanoparticles on glass substrates via nanoimprinting and dewetting of metallic thin films. Glass templates were made via pattern transfer from a topographic Si mold to an inorganically cross-linked sol–gel (IGSG resist on glass using a two-layer polydimethylsiloxane (PDMS stamp followed by annealing, which turned the imprinted resist into pure silica. The transparent, topographic glass successfully templated the assembly of Au and Ag nanoparticle arrays via thin-film deposition and dewetting at elevated temperatures. The microstructural and mechanical characteristics that developed during the processes were discussed. The results are promising for low-cost mass fabrication of devices for several photonic applications.

  12. Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting.

    Science.gov (United States)

    Lee, Sun-Kyu; Hwang, Sori; Kim, Yoon-Kee; Oh, Yong-Jun

    2017-01-01

    We propose a nanofabrication process to generate large-area arrays of noble metal nanoparticles on glass substrates via nanoimprinting and dewetting of metallic thin films. Glass templates were made via pattern transfer from a topographic Si mold to an inorganically cross-linked sol-gel (IGSG) resist on glass using a two-layer polydimethylsiloxane (PDMS) stamp followed by annealing, which turned the imprinted resist into pure silica. The transparent, topographic glass successfully templated the assembly of Au and Ag nanoparticle arrays via thin-film deposition and dewetting at elevated temperatures. The microstructural and mechanical characteristics that developed during the processes were discussed. The results are promising for low-cost mass fabrication of devices for several photonic applications.

  13. A compact system for large-area thermal nanoimprint lithography using smart stamps

    International Nuclear Information System (INIS)

    Pedersen, R H; Hansen, O; Kristensen, A

    2008-01-01

    We present a simple apparatus for thermal nanoimprint lithography. In this work, the stamp is designed to significantly reduce the requirements for pressure application on the external imprint system. By MEMS-based processing, an air cavity inside the stamp is created, and the required pressure for successful imprint is reduced. Additionally, the stamp is capable of performing controlled demolding after imprint. Due to the complexity of the stamp, a compact and cost-effective imprint apparatus can be constructed. The design and fabrication of the advanced stamp as well as the simple imprint equipment is presented. Test imprints of micrometer- and nanometer-scale structures are performed and characterized with respect to uniformity across a large area (35 mm radius). State-of-the-art uniformity for µm-scale features is demonstrated

  14. Polymer waveguide Bragg grating Fabry–Perot filter using a nanoimprinting technique

    International Nuclear Information System (INIS)

    Binfeng, Yun; Guohua, Hu; Yiping, Cui

    2014-01-01

    A narrow band waveguide Fabry–Perot filter at 1550 nm, which is composed of two polymer waveguide Bragg gratings as reflectors, is presented. By using conventional lithography, a low-loss polymer channel waveguide was fabricated, and the submicron Bragg grating structure was transferred onto the waveguide surface using a nanoimprinting technique. The transmission spectrum of the device was measured, and the results show that there is a very narrow transmission peak, with a 3 dB bandwidth of 0.011 nm in the 0.38 nm rejection band of the waveguide Bragg grating. A quality factor of Q ≈ 1.41 × 10 5 is achieved. The insertion loss and the extinction ratio of the Fabry–Perot filter are about −12.5 dB and 17 dB, respectively. In addition, the measured transmission spectrum is in excellent accordance with the numerical simulation. (paper)

  15. Nanoimprint-Transfer-Patterned Solids Enhance Light Absorption in Colloidal Quantum Dot Solar Cells

    KAUST Repository

    Kim, Younghoon

    2017-03-13

    Colloidal quantum dot (CQD) materials are of interest in thin-film solar cells due to their size-tunable bandgap and low-cost solution-processing. However, CQD solar cells suffer from inefficient charge extraction over the film thicknesses required for complete absorption of solar light. Here we show a new strategy to enhance light absorption in CQD solar cells by nanostructuring the CQD film itself at the back interface. We use two-dimensional finite-difference time-domain (FDTD) simulations to study quantitatively the light absorption enhancement in nanostructured back interfaces in CQD solar cells. We implement this experimentally by demonstrating a nanoimprint-transfer-patterning (NTP) process for the fabrication of nanostructured CQD solids with highly ordered patterns. We show that this approach enables a boost in the power conversion efficiency in CQD solar cells primarily due to an increase in short-circuit current density as a result of enhanced absorption through light-trapping.

  16. Novel magnetic wire fabrication process by way of nanoimprint lithography for current induced magnetization switching

    Science.gov (United States)

    Asari, Tsukasa; Shibata, Ryosuke; Awano, Hiroyuki

    2017-05-01

    Nanoimprint lithography (NIL) is an effective method to fabricate nanowire because it does not need expensive systems and this process is easier than conventional processes. In this letter, we report the Current Induced Magnetization Switching (CIMS) in perpendicularly magnetized Tb-Co alloy nanowire fabricated by NIL. The CIMS in Tb-Co alloy wire was observed by using current pulse under in-plane external magnetic field (HL). We successfully observed the CIMS in Tb-Co wire fabricated by NIL. Additionally, we found that the critical current density (Jc) for the CIMS in the Tb-Co wire fabricated by NIL is 4 times smaller than that fabricated by conventional lift-off process under HL = 200Oe. These results indicate that the NIL is effective method for the CIMS.

  17. Polymer microlens replication by Nanoimprint Lithography using proton beam fabricated Ni stamp

    International Nuclear Information System (INIS)

    Dutta, R.K.; Kan, J.A. van; Bettiol, A.A.; Watt, F.

    2007-01-01

    It is essential to have a simplified and a rapid method for fabricating micro/nano structures in different kinds of polymeric materials. Though it is possible to fabricate arrays of microlens directly by P beam writing (PBW), it is restricted to a few types of resist materials. Therefore we have fabricated a Ni electroplated metallic stamp comprising of arrays of inverse/negative features of microlenses. The metallic stamp of about 500 μm thick is made on a silicon wafer coated with 10 μm thick polymethylglutarimide (PMGI) resist and the desired structures are written by PBW followed by thermal reflow and Ni electroplating. An array of microlenses is imprinted on a polycarbonate (PC) substrate by the Nanoimprint Lithography (NIL) technique and the replicated microlenses featuring various numerical apertures, diameters and pitches are characterized

  18. Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

    Science.gov (United States)

    Bossard, M.; Boussey, J.; Le Drogoff, B.; Chaker, M.

    2016-02-01

    Nanoimprint templates made of diamond-like carbon (DLC) and amorphous silicon carbide (SiC) thin films and fluorine-doped associated materials, i.e. F-DLC and F-SiC were investigated in the context of thermal nanoimprint lithography (NIL) with respect to their release properties. Their performances in terms of durability and stability were evaluated and compared to those of conventional silicon or silica molds coated with antisticking molecules applied as a self-assembled monolayer. Plasma-enhanced chemical vapor deposition parameters were firstly tuned to optimize mechanical and structural properties of the DLC and SiC thin films. The impact of the amount of fluorine dopant on the deposited thin films properties was then analyzed. A comparative analysis of DLC, F-DLC as well as SiC and F-SiC molds was then carried out over multiple imprints, performed into poly (methyl methacrylate) (PMMA) thermo-plastic resist. The release properties of un-patterned films were evaluated by the measurement of demolding energies and surface energies, associated with a systematic analysis of the mold surface contamination. These analyses showed that the developed materials behave as intrinsically easy-demolding and contamination-free molds over series of up to 40 imprints. To our knowledge, it is the first time that such a large number of imprints has been considered within an exhaustive comparative study of materials for NIL. Finally, the developed materials went through standard e-beam lithography and plasma etching processes to obtain nanoscale-patterned templates. The replicas of those patterned molds, imprinted into PMMA, were shown to be of high fidelity and good stability after several imprints.

  19. Computational study of a high-temperature thermal nanoimprint lithographic (TNIL) process

    Science.gov (United States)

    Cleveland, Nicolas Joseph

    As an emerging manufacturing technique, nanoimprint lithography (NIL) can fabricate micro and nanoscale features of microfluidic devices at very high accuracy and reliability. The process parameters such as pressure, temperature, and material properties play critical roles in the NIL process. In this work, the process of thermal nanoimprint lithography (TNIL) is studied computationally and the developed model can accurately predict the nano and micro-pattern geometry and quality from TNIL processes based on complex mold-resist interaction. Applications of this modeling technique range from micro- and nano-patterns used in micro-channels for biomedical devices to other applications such as biological/particle sensors or superhydrophobic surfaces. In high-temperature TNIL process, a polymer melt such as polymethyl-methacrylate (PMMA) is heated beyond the melting temperature so that it behaves predominantly as a fluid during the imprint process. The effects of surface tension and shear thinning become significant at or above the melting point, whereas the polymer melt can be modeled as a viscoelastic solid, solved with finite element analysis, when process temperature remains between the glass transition and melting temperatures. Additionally, the mold used in TNIL can deform since it is made of soft-rubbery elastomer such as polydimethylsiloxane (PDMS), and it is of interest to include the effect of subsequent mold deformation. Leakage between channels or significant variation in channel width can occur in micro-fluidic devices if mold deformation exceeds design tolerances. In the current work, fluid-structure interaction (FSI) technology is leveraged to solve for significant mold deformation and its effect on the polymer melt flow field during TNIL process. The simulation result is compared to experimental results. The FSI simulation result is also compared to the equivalent case with a rigid mold in place of flexible material, which shows results of differing mold

  20. Allergic contact dermatitis to plastic banknotes.

    Science.gov (United States)

    Mohamed, M; Delaney, T A; Horton, J J

    1999-08-01

    Allergic contact dermatitis to ultraviolet (UV) cured acrylates occurs predominantly in occupationally exposed workers. Two men presented with dermatitis coinciding with the location of banknotes in their pockets. Patch testing confirmed allergic contact dermatitis to multiple acrylates and Australian plastic banknotes. This is the first report of contact allergy to acrylates present in Australian plastic banknotes.

  1. Experiments towards establishing of design rules for R2R-UV-NIL with polymer working shims

    Science.gov (United States)

    Nees, Dieter; Ruttloff, Stephan; Palfinger, Ursula; Stadlober, Barbara

    2016-03-01

    Roll-to-Roll-UV-nanoimprint lithography (R2R-UV-NIL) enables high resolution large area patterning of flexible substrates and is therefore of increasing industrial interest. We have set up a custom-made R2R-UV-NIL pilot machine which is able to convert 10 inch wide web with velocities of up to 30 m/min. In addition, we have developed self-replicable UV-curable resins with tunable surface energy and Young's modulus for UV-imprint material as well as for polymer working stamp/shim manufacturing. Now we have designed test patterns for the evaluation of the impact of structure shape, critical dimension, pitch, depth, side wall angle and orientation relative to the web movement onto the imprint fidelity and working shim life time. We have used female (recessed structures) silicon masters of that design with critical dimensions between CD = 200 nm and 1600 nm, and structure depths of d = 500 nm and 1000 nm - all with vertical as well as inclined side walls. These entire master patterns have been transferred onto single male (protruding structures) R2R polymer working shims. The polymer working shims have been used for R2R-UV-NIL runs of several hundred meters and the imprint fidelity and process stability of the various test patterns have been compared. This study is intended as a first step towards establishing of design rules and developing of nanoimprint proximity correction strategies for industrial R2R-UV-NIL processes using polymer working shims.

  2. Flexible palladium-based H2 sensor with fast response and low leakage detection by nanoimprint lithography.

    Science.gov (United States)

    Lim, Su Hui; Radha, Boya; Chan, Jie Yong; Saifullah, Mohammad S M; Kulkarni, Giridhar U; Ho, Ghim Wei

    2013-08-14

    Flexible palladium-based H2 sensors have a great potential in advanced sensing applications, as they offer advantages such as light weight, space conservation, and mechanical durability. Despite these advantages, the paucity of such sensors is due to the fact that they are difficult to fabricate while maintaining excellent sensing performance. Here, we demonstrate, using direct nanoimprint lithography of palladium, the fabrication of a flexible, durable, and fast responsive H2 sensor that is capable of detecting H2 gas concentration as low as 50 ppm. High resolution and high throughput patterning of palladium gratings over a 2 cm × 1 cm area on a rigid substrate was achieved by heat-treating nanoimprinted palladium benzyl mercaptide at 250 °C for 1 h. The flexible and robust H2 sensing device was fabricated by subsequent transfer nanoimprinting of these gratings into a polycarbonate film at its glass transition temperature. This technique produces flexible H2 sensors with improved durability, sensitivity, and response time in comparison to palladium thin films. At ambient pressure and temperature, the device showed a fast response time of 18 s at a H2 concentration of 3500 ppm. At 50 ppm concentration, the response time was found to be 57 s. The flexibility of the sensor does not appear to compromise its performance.

  3. Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

    Science.gov (United States)

    Kim, Jong-Moo; Park, Keum-Hwan; Kim, Da-Som; Hwang, Bo-yeon; Kim, Sun-Kyung; Chae, Hee-Man; Ju, Byeong-Kwon; Kim, Young-Seok

    2018-01-01

    Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

  4. Enhancement of the fluorescence intensity of DNA intercalators using nano-imprinted 2-dimensional photonic crystal

    International Nuclear Information System (INIS)

    Endo, Tatsuro; Ueda, China; Hisamoto, Hideaki; Kajita, Hiroshi; Okuda, Norimichi; Tanaka, Satoru

    2013-01-01

    We have fabricated polymer-based 2-dimensional photonic crystals that play a key role in enhancing the fluorescence of DNA intercalators. Highly ordered 2-dimensional photonic crystals possessing triangle-shaped and nm-sized hole arrays were fabricated on a 100 μm thick polymer film using nano-imprint lithography. Samples of double-stranded DNAs (sizes: 4361 and 48502 bp; concentration: 1 pM to 10 nM) were adsorbed on the surface of the 2-dimensional photonic crystal by electrostatic interactions and then treated with intercalators. It is found that the fluorescence intensity of the intercalator is enhanced by a factor of up to 10 compared to the enhancement in the absence of the 2-dimensional photonic crystal. Fluorescence intensity increases with increasing length and concentration of the DNAs. If the 2-dimensional photonic crystal is used as a Bragg reflection mirror, the enhancement of fluorescence intensity can be easily observed using a conventional spectrofluorometer. These results suggest that the printed photonic crystal offers a great potential for highly sensitive intercalator-based fluorescent detection of DNAs. (author)

  5. Efficient low bandgap polymer solar cell with ordered heterojunction defined by nanoimprint lithography.

    Science.gov (United States)

    Yang, Yi; Mielczarek, Kamil; Zakhidov, Anvar; Hu, Walter

    2014-11-12

    In this work, we demonstrate the feasibility of using nanoimprint lithography (NIL) to make efficient low bandgap polymer solar cells with well-ordered heterojunction. High quality low bandgap conjugated polymer poly[2,6-(4,4-bis(2-ethylhexyl)-4H-cyclopenta[2,1-b;3,4-b']-dithiophene)-alt-4,7-(2,1,3-benzothiadiazole)] (PCPDTBT) nanogratings are fabricated using this technique for the first time. The geometry effect of PCPDTBT nanostructures on the solar cell performance is investigated by making PCPDTBT/C70 solar cells with different feature sizes of PCPDTBT nanogratings. It is found that the power conversion efficiency (PCE) increases with increasing nanograting height, PCPDTBT/C70 junction area, and decreasing nanograting width. We also find that NIL makes PCPDTBT chains interact more strongly and form an improved structural ordering. Solar cells made on the highest aspect ratio PCPDTBT nanostructures are among the best reported devices using the same material with a PCE of 5.5%.

  6. Highly uniform residual layers for arrays of 3D nanoimprinted cavities in Fabry-Pérot-filter-array-based nanospectrometers

    Science.gov (United States)

    Memon, Imran; Shen, Yannan; Khan, Abdullah; Woidt, Carsten; Hillmer, Hartmut

    2016-04-01

    Miniaturized optical spectrometers can be implemented by an array of Fabry-Pérot (FP) filters. FP filters are composed of two highly reflecting parallel mirrors and a resonance cavity. Each filter transmits a small spectral band (filter line) depending on its individual cavity height. The optical nanospectrometer, a miniaturized FP-based spectrometer, implements 3D NanoImprint technology for the fabrication of multiple FP filter cavities in a single process step. However, it is challenging to avoid the dependency of residual layer (RL) thickness on the shape of the printed patterns in NanoImprint. Since in a nanospectrometer the filter cavities vary in height between neighboring FP filters and, thus, the volume of each cavity varies causing that the RL varies slightly or noticeably between different filters. This is one of the few disadvantages of NanoImprint using soft templates such as substrate conformal imprint lithography which is used in this paper. The advantages of large area soft templates can be revealed substantially if the problem of laterally inhomogeneous RLs can be avoided or reduced considerably. In the case of the nanospectrometer, non-uniform RLs lead to random variations in the designed cavity heights resulting in the shift of desired filter lines. To achieve highly uniform RLs, we report a volume-equalized template design with the lateral distribution of 64 different cavity heights into several units with each unit comprising four cavity heights. The average volume of each unit is kept constant to obtain uniform filling of imprint material per unit area. The imprint results, based on the volume-equalized template, demonstrate highly uniform RLs of 110 nm thickness.

  7. Multilayered Magnetic Nanoparticles Fabricated by Nanoimprint Lithography for Magnetomechanical Treatment of Cancer

    Science.gov (United States)

    Kwon, Byung Seok

    Fe3O4-magetite nanoparticles have received wide interest as prominent agents for various biomedical applications, ranging from target-specific cancer treatment, gene therapy, and Magnetic Particle Imaging (MPI). However, Fe3O4-magnetite nanoparticles, synthesized by chemical methods beyond a certain size, present challenges in controlling size distribution and shape. Similarly, Fe3O 4-magnetite nanoparticles fabricated by conventional top-down lithographic methods present difficulty of controlling defects and lead to agglomeration due to large size. In order to overcome the difficulties associated with the conventional chemical and top-down lithographic methods, it is critical to develop a fabrication method which produces homogeneous nanoparticles in large quantities with the control of size, defects, and structure. Furthermore, the concept of cell death induced by mechanical perturbation has received wide attention as a way to maximize the cancer cell death with minimal side effects. Previous study has proposed the use of permalloy disk-shaped vortex state microparticles, in order to create cancer cell death by mechanical force. However, insufficient biocompatibility, inadequate mechanical force created by vortex switching, and inability to control the particle size have been critical issues to be further researched and proceeded for in vivo application. Hence, we studied physical and magnetic properties of Fe3O 4 as a material in thin film form and proceeded to develop Fe3 O4 based synthetic antiferromagnetic (SAF) thin films. Then, we combined these favorable physical/magnetic properties with nanoimprint lithography to fabricate homogeneously patterned synthetic antiferromagnetic (SAF) nanoparticles (wafer area >1 x 1 cm2) with the control of size, shape and structure. Then we demonstrated the release of these particles in an aqueous environment. The fabrication process combines a tetrafluoroethylene (ETFE) "working stamp", a bi-layer resist lift-off, defect

  8. A method for manufacturing a tool part for an injection molding process, a hot embossing process, a nano-imprint process, or an extrusion process

    DEFF Research Database (Denmark)

    2013-01-01

    The present invention relates to a method for manufacturing a tool part for an injection molding process, a hot embossing process, nano-imprint process or an extrusion process. First, there is provided a master structure (10) with a surface area comprising nanometre-sized protrusions (11...

  9. Der Effekt UV-blockierender Kontaktlinsen bei der Therapie der Keratitis superficialis chronica des Hundes

    OpenAIRE

    Denk, Nora

    2009-01-01

    Objective Canine chronic superficial keratitis (CSK) is chronic, progressive keratopathy, which is suspected to be caused by an immune mediated response triggered by ultraviolet light exposure. The purpose of this study was to evaluate the effect of UV-blocking soft contact lenses in treatment for CSK. Methods 26 dogs (26 eyes) with CSK were treated continuously with UV-blocking contact lenses (*Acri.Pat®-UV bandage lenses) for six months. A contact lens was placed on one eye of eac...

  10. A study on UV irradiated HDPE

    International Nuclear Information System (INIS)

    Sang Haibo; Liu Zimin; Wu Shishan; Shen Jian

    2006-01-01

    The structure and properties of HDPE irradiated by ultraviolet (UV) in ozone atmosphere were studied by FT-IR, XPS, gel, and water contact angle test. The oxygen-containing groups such as C=O, C-O and C(=O)O were introduced onto high density polyethylene (HDPE) chains through ultraviolet irradiation in ozone atmosphere, their content increased with the UV irradiation time. Under the same UV irradiation conditions, amount of the oxygen-containing groups introduced in ozone atmosphere was more than that in air atmosphere, indicating that the speed of oxygen-containing groups introduced through UV irradiation in ozone atmosphere was faster than that in air. Therefore, HDPE could be quickly functionalized through UV irradiation in ozone atmosphere. There was no gel formed in the HDPE irradiated in ozone atmosphere. After UV irradiation, the water contact angle of HDPE decreased, and its hydrophilicity was improved, suggesting that the compatibility between the irradiated HDPE and polar polymer or inorganic fillers may be better. Compared with HDPE, the temperature of initial weight loss for irradiated HDPE decreased. The structure and properties of irradiated HDPE/CaCO 3 blend were also investigated. The results showed that the compatibility and interfacial action of the irradiated HDPE/CaCO 3 blend were improved compared to that of HDPE/CaCO 3 blend. The mechanical properties of irradiated HDPE/CaCO 3 blend increased with increasing irradiation time. (authors)

  11. Contact lens surface by electron beam

    International Nuclear Information System (INIS)

    Shin, Jung Hyuck; Lee, Suk Ju; Hwang, Kwang Ha; Jeon Jin

    2011-01-01

    Contact lens materials needs good biocompatibility, high refractive index, high optical transparency, high water content etc. Surface treat method by using plasma and radiation can modify the physical and/or chemical properties of the contact lens surface. Radiation technology such as electron beam irradiation can apply to polymerization reaction and enhance the functionality of the polymer.The purpose of this study is to modify of contact lens surface by using Eb irradiation technology. Electron beam was irradiated to the contact lens surface which was synthesized thermal polymerization method and commercial contact lens to modify physical and chemical properties. Ft-IR, XP, UV-vis spectrophotometer, water content, oxygen trans-metastability were used to characterize the surface state, physicochemical, and optical property of the contact lens treated with Eb. The water content and oxygen transmissibility of the contact lens treated with Eb were increased due to increase in the hydrophilic group such as O-C=O and OH group on the contact lens surface which could be produced by possible reaction between carbon and oxygen during the Eb irradiation. All of the lenses showed the high optical transmittance above 90%. In this case of B/Es, TES, Ti contact lens, the optical transmittance decreased about 5% with increasing Eb dose in the wavelength of UV-B region. The contact lens modified by Eb irradiation could improve the physical properties of the contact lens such as water content and oxygen transmissibility

  12. LANL Contacts

    Science.gov (United States)

    : (505) 665-3664 ethics@lanl.gov Journalist queries Communications Office (505) 667-7000 Media contacts programs and employee resources. General Employee directory Emergency communication Communications Office (505) 667-7000 Ethics & Audits Internal Audit: (505) 665-3104 Ethics Office: (505) 667-7506 Fax

  13. Índice UV

    Science.gov (United States)

    Información general sobre el Índice UV que proporciona un pronóstico del riesgo esperado de sobreexposición a la radiación ultravioleta (UV) del sol. El índice UV va acompañado de recomendaciones para protegerse del sol.

  14. uv dye lasers

    International Nuclear Information System (INIS)

    Abakumov, G.A.; Fadeev, V.V.; Khokhlov, R.V.; Simonov, A.P.

    1975-01-01

    The most important property of visible dye lasers, that is, continuous wavelength tuning, stimulated the search for dyes capable to lase in uv. They were found in 1968. Now the need for tunable uv lasers for applications in spectroscopy, photochemistry, isotope separation, remote air and sea probing, etc. is clearly seen. A review of some recent advances in uv dye lasers is reviewed

  15. Reflectance spectra characteristics from an SPR grating fabricated by nano-imprint lithography technique for biochemical nanosensor applications

    Science.gov (United States)

    Setiya Pradana, Jalu; Hidayat, Rahmat

    2018-04-01

    In this paper, we report our research work on developing a Surface Plasmon Resonance (SPR) element with sub-micron (hundreds of nanometers) periodicity grating structure. This grating structure was fabricated by using a simple nano-imprint lithography technique from an organically siloxane polymers, which was then covered by nanometer thin gold layer. The formed grating structure was a very well defined square-shaped periodic structure. The measured reflectance spectra indicate the SPR wave excitation on this grating structure. For comparison, the simulations of reflectance spectra have been also carried out by using Rigorous Coupled-Wave Analysis (RCWA) method. The experimental results are in very good agreement with the simulation results.

  16. Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation

    International Nuclear Information System (INIS)

    Xie Yue-Hong; Xu Jian-Gang; Zhang Yun-Guang; Song Hai-Yang

    2015-01-01

    The effects of a twin boundary (TB) on the mechanical properties of two types of bicrystal Al thin films during the nanoimprint process are investigated by using molecular dynamics simulations. The results indicate that for the TB direction parallel to the imprinting direction, the yield stress reaches the maximum for the initial dislocation nucleation when the mould directly imprints to the TB, and the yield stress first decreases with the increase of the marker interval and then increases. However, for the TB direction perpendicular to the imprinting direction, the effect of the TB location to the imprinting forces is very small, and the yield stress is greater than that with the TB direction parallel to the imprinting direction. The results also demonstrate that the direction of the slip dislocations and the deformation of the thin film caused by spring-back are different due to various positions and directions of the TB. (paper)

  17. 3D visualization of mold filling stages in thermal nanoimprint by white light interferometry and atomic force microscopy

    International Nuclear Information System (INIS)

    Schift, Helmut; Gobrecht, Jens; Kim, Geehong; Lee, Jaejong

    2009-01-01

    A method for continuous 3D visualization of the mold filling at a microscopic level during a thermoplastic nanoimprint process was developed. It is based on superposition of micrographs of a series of different stages of imprint. It was applied to two common 3D microscopies with different resolution limitations. Due to advanced image processing, the animated movie sequence, available as supplementary multimedia information in the online version of this journal, gives an unprecedented insight into the complex polymer flow and shows how voids are forming and vanishing during the imprint process around micropillars. The method has advantages over current real-time methods and can be used as an analytical tool for optimization of processes and improvement of stamp design down to the sub-10 nm nanometer range.

  18. Fabrication of nano-sized metal patterns on flexible polyethylene-terephthalate substrate using bi-layer nanoimprint lithography

    Energy Technology Data Exchange (ETDEWEB)

    Hwang, Seon Yong; Jung, Ho Yong [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); Jeong, Jun-Ho [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, Yuseong-gu Daejeon, 305-343 (Korea, Republic of); Lee, Heon, E-mail: heonlee@korea.ac.k [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of)

    2009-05-29

    Polymer films are widely used as a substrate for displays and for solar cells since they are cheap, transparent and flexible, and their material properties are easy to design. Polyethylene-terephthalate (PET) is especially useful for various applications requiring transparency, flexibility and good thermal and chemical resistance. In this study, nano-sized metal patterns were fabricated on flexible PET film by using nanoimprint lithography (NIL). Water-soluble poly-vinyl alcohol (PVA) resin was used as a planarization and sacrificial layer for the lift-off process, as it does not damage the PET films and can easily be etched off by using oxygen plasma. NIL was used to fabricate the nano-sized patterns on the non-planar or flexible substrate. Finally, a nano-sized metal pattern was successfully formed by depositing the metal layer over the imprinted resist patterns and applying the lift-off process, which is economic and environmentally friendly, to the PET films.

  19. Low temperature fabrication of conductive silver lines and dots via transfer-printing and nanoimprinting lithography techniques

    International Nuclear Information System (INIS)

    Wu, Chun-Chang; Hsu, Steve Lien-Chung; Chiu, Ching-Wei; Wu, Jung-Tang

    2013-01-01

    In this work, we have developed novel methods to fabricate conductive silver tracks and dots directly from silver nitrate solution by transfer-printing and nanoimprinting lithography techniques, which are inexpensive and can be scaled down to the nanometer scale. The silver nitrate precursor can be reduced in ethylene glycol vapor to form silver at low temperatures. Energy dispersive spectrometric analysis results indicate that the silver nitrate has been converted to silver completely. In order to obtain smooth and continuous conductive patterned silver features with high resolution, the silver lines with widths of a few tens of micrometers to nanometers were patterned by using a spin-coating approach. Using a 14 M silver nitrate solution, continuous silver conductive lines with a resistivity of 8.45 × 10 −5 Ω cm has been produced. (paper)

  20. Nanoimprinted backside reflectors for a-Si:H thin-film solar cells: critical role of absorber front textures.

    Science.gov (United States)

    Tsao, Yao-Chung; Fisker, Christian; Pedersen, Thomas Garm

    2014-05-05

    The development of optimal backside reflectors (BSRs) is crucial for future low cost and high efficiency silicon (Si) thin-film solar cells. In this work, nanostructured polymer substrates with aluminum coatings intended as BSRs were produced by positive and negative nanoimprint lithography (NIL) techniques, and hydrogenated amorphous silicon (a-Si:H) was deposited hereon as absorbing layers. The relationship between optical properties and geometry of front textures was studied by combining experimental reflectance spectra and theoretical simulations. It was found that a significant height variation on front textures plays a critical role for light-trapping enhancement in solar cell applications. As a part of sample preparation, a transfer NIL process was developed to overcome the problem of low heat deflection temperature of polymer substrates during solar cell fabrication.

  1. Large-area 2D periodic crystalline silicon nanodome arrays on nanoimprinted glass exhibiting photonic band structure effects

    International Nuclear Information System (INIS)

    Becker, C; Lockau, D; Sontheimer, T; Rech, B; Schubert-Bischoff, P; Rudigier-Voigt, E; Bockmeyer, M; Schmidt, F

    2012-01-01

    Two-dimensional silicon nanodome arrays are prepared on large areas up to 50 cm 2 exhibiting photonic band structure effects in the near-infrared and visible wavelength region by downscaling a recently developed fabrication method based on nanoimprint-patterned glass, high-rate electron-beam evaporation of silicon, self-organized solid phase crystallization and wet-chemical etching. The silicon nanodomes, arranged in square lattice geometry with 300 nm lattice constant, are optically characterized by angular resolved reflection measurements, allowing the partial determination of the photonic band structure. This experimentally determined band structure agrees well with the outcome of three-dimensional optical finite-element simulations. A 16% photonic bandgap is predicted for an optimized geometry of the silicon nanodome arrays. By variation of the duration of the selective etching step, the geometry as well as the optical properties of the periodic silicon nanodome arrays can be controlled systematically. (paper)

  2. Carbon nanotube charge collectors for nanoimprinted hybrid perovskite photovoltaics (Conference Presentation)

    Science.gov (United States)

    Zakhidov, Anvar A.; Haroldson, Ross; Saranin, Danila; Martinez, Patricia; Ishteev, Artur

    2017-06-01

    "protected" hybrid perovskites. We suggest that some of this unusual properties can be attributed to a special type of "dipole rotational polaron" formed in their lattice due to interactions of charge with methyl-ammonium organic dipoles, each of 2.3 Debye. Examples of perovskite solar cell with transparent CNT charge collectors will demonstrated the 3 D charge collection in the monolithic tandems of perovskite PV with other dissimilar materials PVs, such as OPV and inorganic PV. We describe the pioneering methods to create highly transparent CNT sheets by dry lamination from vertically alligned CVD forests of MWCNTs. Transparency can be further increased by converting CNT aerogels into locally collapsed meshs with micron scale oppenings by spraying Ag nanowires, which lowers sheet resistance to values of Rsh< 40 ohm/sq. such AgNW@CNT transparent sheets are ideal interlayers in three terminal tandems of perovskite PV with polymeric OPV and/or inorganic solar cells. We show that nanoimprinting can further improve the performance of perovskite photodetectors and optoelectronic devices

  3. Investigation of GaN-based light emitting diodes with nano-hole patterned sapphire substrate (NHPSS) by nano-imprint lithography

    International Nuclear Information System (INIS)

    Huang, H.W.; Lin, C.H.; Huang, J.K.; Lee, K.Y.; Lin, C.F.; Yu, C.C.; Tsai, J.Y.; Hsueh, R.; Kuo, H.C.; Wang, S.C.

    2009-01-01

    In this paper, gallium-nitride (GaN)-based light-emitting diodes (LEDs) with nano-hole patterned sapphire (NHPSS) by nano-imprint lithography are fabricated and investigated. At an injection current of 20 mA, the LED with NHPSS increased the light output power of the InGaN/GaN multiple quantum well LEDs by a factor of 1.33, and the wall-plug efficiency is 30% higher at 20 mA indicating that the LED with NHPSS had larger light extraction efficiency. In addition, by examining the radiation patterns, the LED with NHPSS shows stronger light extraction with a wider view angle. These results offer promising potential to enhance the light output powers of commercial light-emitting devices using the technique of nano-imprint lithography.

  4. Deep UV LEDs

    Science.gov (United States)

    Han, Jung; Amano, Hiroshi; Schowalter, Leo

    2014-06-01

    article by Jiang et al on using BN for UV devices; potentially as a p-type wide band gap semiconductor contact. Finally, an in-depth discussion of one DUV application in defense, the non-line-of-sight (NLOS) communication, is given by Drost and Sadler. Overall, we believe that this special issue of Semiconductor Science and Technology provides a useful overview of the state-of-art in the field on DUV materials and devices. In view of the rapidly growing interest in this field, the demonstrated enhanced device performance, and the wide range of applications, this special issue can be considered a very timely contribution. Finally, we would like to thank the IOP editorial staff, in particular Alice Malhador, for their support and also like to thank all contributors for their efforts to make this special issue possible.

  5. Prioritized Contact Transport Stream

    Science.gov (United States)

    Hunt, Walter Lee, Jr. (Inventor)

    2015-01-01

    A detection process, contact recognition process, classification process, and identification process are applied to raw sensor data to produce an identified contact record set containing one or more identified contact records. A prioritization process is applied to the identified contact record set to assign a contact priority to each contact record in the identified contact record set. Data are removed from the contact records in the identified contact record set based on the contact priorities assigned to those contact records. A first contact stream is produced from the resulting contact records. The first contact stream is streamed in a contact transport stream. The contact transport stream may include and stream additional contact streams. The contact transport stream may be varied dynamically over time based on parameters such as available bandwidth, contact priority, presence/absence of contacts, system state, and configuration parameters.

  6. Inactivation of Aspergillus flavus in drinking water after treatment with UV irradiation followed by chlorination

    International Nuclear Information System (INIS)

    Al-Gabr, Hamid Mohammad; Zheng, Tianling; Yu, Xin

    2013-01-01

    The disinfection process for inactivating microorganisms at drinking water treatment plants is aimed for safety of drinking water for humans from a microorganism, such as bacteria, viruses, algae, fungi by using chlorination, ozonation, UV irradiation, etc. In the present study, a combination of two disinfectants, UV irradiation followed by chlorination, was evaluated for inactivating Aspergillus flavus under low contact time and low dosage of UV irradiation. The results indicated an inverse correlation between the inactivation of A. flavus by using UV irradiation only or chlorination alone. By using UV radiation, the 2 log 10 control of A. flavus was achieved after 30 s of irradiation, while chlorination was observed to be more effective than UV, where the 2 log was achieved at chlorine concentration of 0.5, 1, 2 and 3 mg/l, in contact time of 60, 5, 1 and 1 min, respectively. However, combined use (UV irradiation followed by chlorination) was more effective than using either UV or chlorination alone; 5 s UV irradiation followed by chlorination produced 4 log 10 reduction of A. flavus at chlorine concentrations of 2 and 3 mg/l under a contact time of 15 min. The results indicated that efficiency of UV irradiation improves when followed by chlorination at low concentrations. - Highlights: • As a disinfectant, chlorine is more effective than UV in inactivating Aspergillus flavus. • As a combined method, UV irradiation followed by chlorination shows high efficiency. • UV irradiation can improve effectiveness of chlorination in reducing Aspergillus flavus

  7. Comets in UV

    Science.gov (United States)

    Shustov, B.; Sachkov, M.; Gómez de Castro, A. I.; Vallejo, J. C.; Kanev, E.; Dorofeeva, V.

    2018-04-01

    Comets are important "eyewitnesses" of Solar System formation and evolution. Important tests to determine the chemical composition and to study the physical processes in cometary nuclei and coma need data in the UV range of the electromagnetic spectrum. Comprehensive and complete studies require additional ground-based observations and in situ experiments. We briefly review observations of comets in the ultraviolet (UV) and discuss the prospects of UV observations of comets and exocomets with space-borne instruments. A special reference is made to the World Space Observatory-Ultraviolet (WSO-UV) project.

  8. Contact Aligner 2 (Front Side): Suss Microtec MA8

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: SussMA8This system utilizes 1X contact lithography to transfer photomask patterns onto substrates Specifications / Capabilities:UV broadband...

  9. UV exposure in cars.

    Science.gov (United States)

    Moehrle, Matthias; Soballa, Martin; Korn, Manfred

    2003-08-01

    There is increasing knowledge about the hazards of solar and ultraviolet (UV) radiation to humans. Although people spend a significant time in cars, data on UV exposure during traveling are lacking. The aim of this study was to obtain basic information on personal UV exposure in cars. UV transmission of car glass samples, windscreen, side and back windows and sunroof, was determined. UV exposure of passengers was evaluated in seven German middle-class cars, fitted with three different types of car windows. UV doses were measured with open or closed windows/sunroof of Mercedes-Benz E 220 T, E 320, and S 500, and in an open convertible car (Mercedes-Benz CLK). Bacillus subtilis spore film dosimeters (Viospor) were attached to the front, vertex, cheeks, upper arms, forearms and thighs of 'adult' and 'child' dummies. UV wavelengths longer than >335 nm were transmitted through car windows, and UV irradiation >380 nm was transmitted through compound glass windscreens. There was some variation in the spectral transmission of side windows according to the type of glass. On the arms, UV exposure was 3-4% of ambient radiation when the car windows were shut, and 25-31% of ambient radiation when the windows were open. In the open convertible car, the relative personal doses reached 62% of ambient radiation. The car glass types examined offer substantial protection against short-wave UV radiation. Professional drivers should keep car windows closed on sunny days to reduce occupational UV exposure. In individuals with polymorphic light eruption, produced by long-wave UVA, additional protection by plastic films, clothes or sunscreens appears necessary.

  10. UV-induced effects

    NARCIS (Netherlands)

    Liebsch, M.; Spielmann, H.; Pape, W.; Krul, C.; Deguercy, A.; Eskes, C.A.M.

    2005-01-01

    Regulatory requirements: According to the current Notes for Guidance of the Scientific Committee on Cosmetic Products and Non-Food Products (SCCNFP), cosmetic ingredients and mixtures of ingredients absorbing UV light (in particular UV filter chemicals used, for example, to ensure the light

  11. Contact Lens Care

    Science.gov (United States)

    ... Consumers Consumer Information by Audience For Women Contact Lens Care Share Tweet Linkedin Pin it More sharing ... www.fda.gov/medwatch Learn More about Contact Lens Care Other Tips on Contact Lenses Decorative Contact ...

  12. UV disinfection of water

    International Nuclear Information System (INIS)

    Skipperud, E.; Johansen; Myhrstad, J.A.

    1978-01-01

    UV radiation has been found to have advantages over chloration for the disinfection of water. New regulations for dietary conditions on Norwegian ships introduced in 1974 led to increased use of UV disinfection, and this has in the following years spread to waterworks. The present article is based on a study to determine possible limitation. The nature of the injuries to the microorganisms is first discussed, together with repair mechanisms. A table is given showing the energy required for 90 and 100 percent inactivation of a number of microorganisms. Some other factors affecting UV inactivation are briefly mentioned. (JIW)

  13. Kinetic removal of haloacetonitrile precursors by photo-based advanced oxidation processes (UV/H2O2, UV/O3, and UV/H2O2/O3).

    Science.gov (United States)

    Srithep, Sirinthip; Phattarapattamawong, Songkeart

    2017-06-01

    The objective of the study is to evaluate the performance of conventional treatment process (i.e., coagulation, flocculation, sedimentation and sand filtration) on the removals of haloacetonitrile (HAN) precursors. In addition, the removals of HAN precursors by photo-based advanced oxidation processes (Photo-AOPs) (i.e., UV/H 2 O 2 , UV/O 3 , and UV/H 2 O 2 /O 3 ) are investigated. The conventional treatment process was ineffective to remove HAN precursors. Among Photo-AOPs, the UV/H 2 O 2 /O 3 was the most effective process for removing HAN precursors, followed by UV/H 2 O 2 , and UV/O 3 , respectively. For 20min contact time, the UV/H 2 O 2 /O 3 , UV/H 2 O 2 , and UV/O 3 suppressed the HAN formations by 54, 42, and 27% reduction. Increasing ozone doses from 1 to 5 mgL -1 in UV/O 3 systems slightly improved the removals of HAN precursors. Changes in pH (6-8) were unaffected most of processes (i.e., UV, UV/H 2 O 2 , and UV/H 2 O 2 /O 3 ), except for the UV/O 3 system that its efficiency was low in the weak acid condition. The pseudo first-order kinetic constant for removals of dichloroacetonitrile precursors (k' DCANFP ) by the UV/H 2 O 2 /O 3 , UV/H 2 O 2 and standalone UV systems were 1.4-2.8 orders magnitude higher than the UV/O 3 process. The kinetic degradation of dissolved organic nitrogen (DON) tended to be higher than the k' DCANFP value. This study firstly differentiates the kinetic degradation between DON and HAN precursors. Copyright © 2017 Elsevier Ltd. All rights reserved.

  14. RIMS (real-time imprint monitoring by scattering of light) study of pressure, temperature and resist effects on nanoimprint lithography

    International Nuclear Information System (INIS)

    Yu Zhaoning; Gao He; Chou, Stephen Y

    2007-01-01

    To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Recently we have developed a real-time imprint monitoring by the scattering-of-light (RIMS) approach, which allows us to detect the degree of resist deformation and the duration of resist penetration by a mould during the imprint process in real time. In this paper we report the performances of RIMS under a broad range of working conditions. RIMS data shows that the resist penetration is facilitated by increasing processing temperature, pressure and the resist film thickness; a prolonged pre-NIL resist baking step, on the other hand, has the effect of slowing it down. Our results provide further demonstration of the effectiveness of this method under different working conditions. RIMS measurements show not only how long an imprint takes to complete, but also how an imprint progresses with time and how it is affected by differences in processing parameters. These measurements provide information crucial for a better understanding and process optimization in NIL

  15. Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials.

    Science.gov (United States)

    Chen, Hao; Zhang, Qi; Chou, Stephen Y

    2015-02-27

    Sapphire nanopatterning is the key solution to GaN light emitting diode (LED) light extraction. One challenge is to etch deep nanostructures with a vertical sidewall in sapphire. Here, we report a study of the effects of two masking materials (SiO2 and Cr) and different etching recipes (the reaction gas ratio, the reaction pressure and the inductive power) in a chlorine-based (BCl3 and Cl2) inductively coupled plasma (ICP) etching of deep nanopillars in sapphire, and the etching process optimization. The masking materials were patterned by nanoimprinting. We have achieved high aspect ratio sapphire nanopillar arrays with a much steeper sidewall than the previous etching methods. We discover that the SiO2 mask has much slower erosion rate than the Cr mask under the same etching condition, leading to the deep cylinder-shaped nanopillars (122 nm diameter, 200 nm pitch, 170 nm high, flat top, and a vertical sidewall of 80° angle), rather than the pyramid-shaped shallow pillars (200 nm based diameter, 52 nm height, and 42° sidewall) resulted by using Cr mask. The processes developed are scalable to large volume LED manufacturing.

  16. Directed Self-assembly of Block Copolymer with Sub-15 nm Domain Spacing Using Nanoimprinted Photoresist Templates

    Science.gov (United States)

    Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Coughlin, E. Bryan; Xiao, Shuaigang; Russell, Thomas

    There has been increasing interest in preparing block copolymer thin films with ultra-small domain spacings for use as etching masks for ultra-high resolution nanolithography. One method to prepare block copolymer materials with small feature sizes is salt doping, increasing the Flory-Huggins interaction and allowing microphase separation to be maintained at lower molecular weights. Lamellae-forming P2VP- b-PS- b-P2VP block copolymer with various molecular weight was synthesized using RAFT polymerization with a dual functional chain transfer agent. Copper (II) Chloride or Gold (III) chloride was found to be selectively associated with P2VP block and increase the unfavorable interactions between PS and P2VP blocks, driving the disordered block copolymer into the ordered state. A 14 nm lamellar spacing of P2VP- b-PS- b-P2VP thin film was prepared using copper (II) Chloride doping after acetone vapor annealing on neutral brushes. Metallic nano-wire arrays were prepared after selective infiltration of platinum salt into the P2VP domain and oxygen plasma treatment. The directed self-assembly of salt doped P2VP- b-PS- b-P2VP triblock copolymer having long-rang lateral order on nanoimprinted photoresist templates with shallow trenches was also studied.

  17. Fabrication of Photonic Crystal Structures on Flexible Organic Light-Emitting Diodes by Using Nano-Imprint and PDMS Mold

    Directory of Open Access Journals (Sweden)

    Ho Ting-Lin

    2016-01-01

    Full Text Available In this paper, nanoimprint lithography was used to create a photonic crystals structure film in organic light-emitting diode (OLED component, and then compare the efficiency of components whether with nanostructure or not. By using two different kinds of mold, such as silicon mold and PDMS mold, the nano structures in PMMA (molecular weight of 350K were fabricated. Nanostructures in period of 403.53nm with silicon mold and nano structures in period of 385.64nm with PDMS mold as photonic crystal films were fabricated and were integrated into OLED. In experimental results, the OLED without photonic crystal films (with packing behaves 193.3cd/m2 for luminous intensity, 3.481cd/A for lightening efficiency (ηL and 0.781 lm/W for lightening power (ηP where V is 14V and I is 5.5537mA; the OLED with photonic crystal films (with packing behaves 241.6cd/m2 for luminous intensity, 4.173cd/A for lightening efficiency (ηL and 0.936 lm/W for lightening power (ηP where voltage of 14V and current (I of 5.7891mA, which shows that the latter perform is well.

  18. Improved sensing characteristics of dual-gate transistor sensor using silicon nanowire arrays defined by nanoimprint lithography

    Science.gov (United States)

    Lim, Cheol-Min; Lee, In-Kyu; Lee, Ki Joong; Oh, Young Kyoung; Shin, Yong-Beom; Cho, Won-Ju

    2017-12-01

    This work describes the construction of a sensitive, stable, and label-free sensor based on a dual-gate field-effect transistor (DG FET), in which uniformly distributed and size-controlled silicon nanowire (SiNW) arrays by nanoimprint lithography act as conductor channels. Compared to previous DG FETs with a planar-type silicon channel layer, the constructed SiNW DG FETs exhibited superior electrical properties including a higher capacitive-coupling ratio of 18.0 and a lower off-state leakage current under high-temperature stress. In addition, while the conventional planar single-gate (SG) FET- and planar DG FET-based pH sensors showed the sensitivities of 56.7 mV/pH and 439.3 mV/pH, respectively, the SiNW DG FET-based pH sensors showed not only a higher sensitivity of 984.1 mV/pH, but also a lower drift rate of 0.8% for pH-sensitivity. This demonstrates that the SiNW DG FETs simultaneously achieve high sensitivity and stability, with significant potential for future biosensing applications.

  19. Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers

    International Nuclear Information System (INIS)

    Simão, Claudia; Khunsin, Worawut; Kehagias, Nikolaos; Sotomayor Torres, Clivia M; Salaun, Mathieu; Zelsmann, Marc; Morris, Michael A

    2014-01-01

    Directed self-assembly of block copolymer polystyrene-b-polyethylene oxide (PS-b-PEO) thin film was achieved by a one-pot methodology of solvent vapor assisted nanoimprint lithography (SAIL). Simultaneous solvent-anneal and imprinting of a PS-b-PEO thin film on silicon without surface pre-treatments yielded a 250 nm line grating decorated with 20 nm diameter nanodots array over a large surface area of up to 4′ wafer scale. The grazing-incidence small-angle x-ray scattering diffraction pattern showed the fidelity of the NIL stamp pattern replication and confirmed the periodicity of the BCP of 40 nm. The order of the hexagonally arranged nanodot lattice was quantified by SEM image analysis using the opposite partner method and compared to conventionally solvent-annealed block copolymer films. The imprint-based SAIL methodology thus demonstrated an improvement in ordering of the nanodot lattice of up to 50%, and allows significant time and cost reduction in the processing of these structures. (papers)

  20. Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography.

    Energy Technology Data Exchange (ETDEWEB)

    Schunk, Peter Randall; King, William P. (Georgia Institute of Technology, Atlanta, GA); Sun, Amy Cha-Tien; Rowland, Harry D. (Georgia Institute of Technology, Atlanta, GA)

    2006-08-01

    This paper presents continuum simulations of polymer flow during nanoimprint lithography (NIL). The simulations capture the underlying physics of polymer flow from the nanometer to millimeter length scale and examine geometry and thermophysical process quantities affecting cavity filling. Variations in embossing tool geometry and polymer film thickness during viscous flow distinguish different flow driving mechanisms. Three parameters can predict polymer deformation mode: cavity width to polymer thickness ratio, polymer supply ratio, and Capillary number. The ratio of cavity width to initial polymer film thickness determines vertically or laterally dominant deformation. The ratio of indenter width to residual film thickness measures polymer supply beneath the indenter which determines Stokes or squeeze flow. The local geometry ratios can predict a fill time based on laminar flow between plates, Stokes flow, or squeeze flow. Characteristic NIL capillary number based on geometry-dependent fill time distinguishes between capillary or viscous driven flows. The three parameters predict filling modes observed in published studies of NIL deformation over nanometer to millimeter length scales. The work seeks to establish process design rules for NIL and to provide tools for the rational design of NIL master templates, resist polymers, and process parameters.

  1. High-throughput fabrication of anti-counterfeiting colloid-based photoluminescent microtags using electrical nanoimprint lithography

    International Nuclear Information System (INIS)

    Diaz, R; Palleau, E; Poirot, D; Sangeetha, N M; Ressier, L

    2014-01-01

    This work demonstrates the excellent capability of the recently developed electrical nanoimprint lithography (e-NIL) technique for quick, high-throughput production of well-defined colloid assemblies on surfaces. This is shown by fabricating micron-sized photoluminescent quick response (QR) codes based on the electrostatic directed trapping (so called nanoxerography process) of 28 nm colloidal lanthanide-doped upconverting NaYF 4 nanocrystals. Influencing experimental parameters have been optimized and the contribution of triboelectrification in e-NIL was evidenced. Under the chosen conditions, more than 300 000 nanocrystal-based QR codes were fabricated on a 4 inch silicon wafer, in less than 15 min. These microtags were then transferred to transparent flexible films, to be easily integrated onto desired products. Invisible to the naked eye, they can be decoded and authenticated using an optical microscopy image of their specific photoluminescence mapping. Beyond this very promising application for product tracking and the anti-counterfeiting strategies, e-NIL nanoxerography, potentially applicable to any types of charged and/or polarizable colloids and pattern geometries opens up tremendous opportunities for industrial scale production of various other kinds of colloid-based devices and sensors. (paper)

  2. Ultraviolet radiation for the sterilization of contact lenses

    International Nuclear Information System (INIS)

    Gritz, D.C.; Lee, T.Y.; McDonnell, P.J.; Shih, K.; Baron, N.

    1990-01-01

    Two sources of ultraviolet (UV) radiation with peak wavelengths in the UV-C or UV-B ranges were compared for their ability to sterilize contact lenses infected with Pseudomonas aeruginosa, Streptococcus pneumoniae, Acanthamoeba castellani, Candida albicans, and Aspergillus niger. Also examined was the effect of prolonged UV light exposure on soft and rigid gas permeable (RGP) contact lenses. The UV-C lamp (253.7 nm, 250 mW/cm2 at 1 cm) was germicidal for all organisms within 20 minutes but caused destruction of the soft lens polymers within 6 hours of cumulative exposure. UV-C caused damage to RGP lenses in less than 100 hours. The UV-B lamp (290-310 nm, 500 mW/cm2 at 1 cm) was germicidal for all organisms tested (except Aspergillus) with a 180-minute exposure and caused less severe changes in the soft lens polymers than did the UV-C lamp, although cumulative exposure of 300 hours did substantially weaken the soft lens material. RGP materials were minimally affected by exposure to 300 hours of UV-B. Ultraviolet light is an effective germicidal agent but is injurious to soft lens polymers; its possible utility in the sterilization of RGP lenses and lens cases deserves further study

  3. Occupational contact urticaria and protein contact dermatitis.

    Science.gov (United States)

    Doutre, Marie-Sylvie

    2005-01-01

    Irritant dermatitis and eczema are the most prevalent occupational skin diseases. Less common are immediate contact reactions such as contact urticaria and protein contact dermatitis. Occupational contact urticaria can be subdivided into two categories, immunological and non immunological. However, some agents can induce these two types of reactions. Contact urticaria to natural rubber latex is particularly frequent among health care personnel, but contact urticaria to a wide variety of other substances occurs in many other occupations. Among those at risk are cooks, bakers, butchers, restaurant personnel, veterinarians, hairdressers, florists, gardeners, and forestry workers. Protein contact dermatitis in some of these occupations is caused principally by proteins of animal or plant origin, especially among individuals with a history of atopic dermatitis. Diagnosis requires careful interrogation, clinical examination and skin tests (open tests and prick tests with immediate lecture) to identify a particular contact allergen.

  4. Nanoimprint-defined, large-area meta-surfaces for unidirectional optical transmission with superior extinction in the visible-to-infrared range.

    Science.gov (United States)

    Yao, Yuhan; Liu, He; Wang, Yifei; Li, Yuanrui; Song, Boxiang; Wang, Richard P; Povinelli, Michelle L; Wu, Wei

    2016-07-11

    Optical devices with asymmetric transmission have important applications in optical systems, but optical isolators with the modal asymmetry can only be built using magneto-optical or nonlinear materials, as dictated by the Lorentz reciprocity theorem. However, optical devices with the power asymmetry can be achieved by linear materials such as metals and dielectrics. In this paper, we report a large-area, nanoimprint-defined meta-surface (stacked subwavelength gratings) with high-contrast asymmetric transmittance in the visible-to-infrared wavelength range for TM-polarized light. The physical origin of asymmetric transmission through the meta-surface is studied by analyzing the scattering matrix.

  5. Evaluation of Combined Peracetic acid and UV treatment for ...

    Science.gov (United States)

    The current study evaluates the effectiveness of the combined application of Peracetic acid and ultraviolet radiation as alternative disinfectant agents to the traditional chlorination of wastewater effluents. Various pathogens (E. coli, enterococci and fecal coliforms) were evaluated in the study. Four experiments were conducted using low to high PAA levels and UV dosages. E. coli and enterococci were resistant to low to moderate PAA dosage (0.5- 1 mg/L). These microbes can be removed effectively at high PAA dosage (2.5 mg/L) with 30 min contact time. Fecal coliforms were completely inactivated even at a low PAA dose of 0.7 mg/L. E. coli was more susceptible to UV disinfection than enterococci at low UV dosages. Enterococci required at least 40 mJ/cm2 for 2.5 log inactivation. In combined PAA + UV treatment, low UV intensities between 7 – 40 mJ/cm2 showed poor disinfection performance at a low PAA concentration of 1.5 mg/L. High UV intensities of 120 and 60 mJ/cm2 inactivated all the pathogens to below detection levels even at low to moderate PAA (0.7 mg/L and 1 mg/L) pretreatment concentration. Combined PAA + UV treatment at 1 mg/L (for 15 and 30 min contact time) + 120 and 60 mJ/cm2 did not show any regrowth of microbes, whereas PAA only disinfection with 15 min contact time showed regrowth of enterococci and fecal coliforms. UV only disinfection showed E. coli regrowth. • This pilot scale study was designed for providing necessary parameter optimization

  6. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... One Use Facts About Colored Contacts and Halloween Safety Colored Contact Lens Facts Over-the-Counter Costume ... Costume Contact Lenses Can Ruin Vision Eye Makeup Safety In fact, it is illegal to sell colored ...

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... One Use Facts About Colored Contacts and Halloween Safety Colored Contact Lens Facts Over-the-Counter Costume ... use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses ...

  8. Nucleation of microcrystalline silicon: on the effect of the substrate surface nature and nano-imprint topography

    International Nuclear Information System (INIS)

    Palmans, J; Faraz, T; Verheijen, M A; Kessels, W M M; Creatore, M

    2016-01-01

    The nucleation of microcrystalline silicon thin-films has been investigated for various substrate natures and topographies. An earlier nucleation onset on aluminium-doped zinc oxide compared to glass substrates has been revealed, associated with a microstructure enhancement and reduced surface energy. Both aspects resulted in a larger crystallite density, following classical nucleation theory. Additionally, the nucleation onset was (plasma deposition) condition-dependent. Therefore, surface chemistry and its interplay with the plasma have been proposed as key factors affecting nucleation and growth. As such, preliminary proof of the substrate nature’s role in microcrystalline silicon growth has been provided. Subsequently, the impact of nano-imprint lithography prepared surfaces on the initial microcrystalline silicon growth has been explored. Strong topographies, with a 5-fold surface area enhancement, led to a reduction in crystalline volume fraction of ∼20%. However, no correlation between topography and microstructure has been found. Instead, the suppressed crystallization has been partially ascribed to a reduced growth flux, limited surface diffusion and increased incubation layer thickness, originating from the surface area enhancement when transiting from flat to nanostructured surfaces. Furthermore, fundamental plasma parameters have been reviewed in relation with surface topography. Strong topographies are not expected to affect the ion-to-growth flux ratio. However, the reduced ion flux (due to increasing surface area) further limited the already weak ion energy transfer to surface processes. Additionally, the atomic hydrogen flux, i.e. the driving force for microcrystalline growth, has been found to decrease by a factor of 10 when transiting from flat to nanostructured topography. This resulted in an almost 6-fold reduction of the hydrogen-to-growth flux ratio, a much stronger effect than the ion-to-growth flux ratio. Since previous studies regarding

  9. Nanostructured surfaces using thermal nanoimprint lithography: Applications in thin membrane technology, piezoelectric energy harvesting and tactile pressure sensing

    Science.gov (United States)

    Nabar, Bhargav Pradip

    Nanoimprint lithography (NIL) is emerging as a viable contender for fabrication of large-scale arrays of 5-500 nm features. The work presented in this dissertation aims to leverage the advantages of NIL for realization of novel Nano Electro Mechanical Systems (NEMS). The first application is a nanoporous membrane blood oxygenator system. A fabrication process for realization of thin nanoporous membranes using thermal nanoimprint lithography is presented. Suspended silicon nitride membranes were fabricated by Low-Pressure Chemical Vapor Deposition (LPCVD) in conjunction with a potassium hydroxide-based bulk micromachining process. Nanoscale features were imprinted into a commercially available thermoplastic polymer resist using a pre-fabricated silicon mold. The pattern was reversed and transferred to a thin aluminum oxide layer by means of a novel two stage lift-off technique. The patterned aluminum oxide was used as an etch mask in a CHF3/He based reactive ion etch process to transfer the pattern to silicon nitride. Highly directional etch profiles with near vertical sidewalls and excellent Si3N4/Al2O3 etch selectivity was observed. One-micrometer-thick porous membranes with varying dimensions of 250x250 microm2 to 450x450 microm 2 and pore diameter of 400 nm have been engineered and evaluated. Results indicate that the membranes have consistent nanopore dimensions and precisely defined porosity, which makes them ideal as gas exchange interfaces in blood oxygenation systems as well as other applications such as dialysis. Additionally, bulk -- micromachined microfluidic channels have been developed for uniform, laminar blood flow with minimal cell trauma. NIL has been used for ordered growth of crystalline nanostructures for sensing and energy harvesting. Highly ordered arrays of crystalline ZnO nanorods have been fabricated using a polymer template patterned by thermal nanoimprint lithography, in conjunction with a low temperature hydrothermal growth process. Zinc

  10. UV Deprivation Influences Social UV Preference in Juvenile Sticklebacks

    Directory of Open Access Journals (Sweden)

    Ricarda Modarressie

    2015-05-01

    Full Text Available Social aggregations occur in many different animal taxa and mainly result from non-random assortment. Investigating factors that shape and maintain the composition of social aggregations are among others a main topic for understanding ecological speciation processes. Aggregation decisions are mediated by olfactory and visual cues, which in many animals are extended into the UV part of the electromagnetic spectrum. Here, we were interested in developmental plasticity of social preferences with respect to UV radiation in aquatic organisms. Specifically, we tested whether different lighting environments with respect to UV wavelengths during early life stages influence the shoaling preference in juvenile threespine sticklebacks (Gasterosteus aculeatus. Family (full-sibling groups were split and reared under UV-lacking (UV- and UV-present (UV+ lighting conditions. Subsequent shoal choice experiments, in which test fish from both rearing conditions could simultaneously choose between a shoal seen behind a UV-blocking (UV- and a shoal seen behind a UV-transmitting (UV+ filter, revealed a significant effect of lighting condition during rearing on association preference. Test fish that had been deprived of UV spent significantly more time near the UV- shoal compared to the test fish reared under full-spectrum lighting conditions. The results are discussed with respect to plasticity of the visual system and environmental lighting conditions.

  11. UV spectroscopy. Ch. 16

    International Nuclear Information System (INIS)

    Stevens, Eugene S.

    1991-01-01

    The use of synchrotron radiation (SR) in the ultraviolet (UV) region by biophysics and biophysical chemists continues to increase as access improves and as awareness of its unique combination of properties grows. SR is continuously tunable, intense (even in the UV region), and pulsed. Pulse characteristics are comparable to those of picosecond lasers, but have the advantage of being independent of wavelength. Drawbacks are the continuous, but slow, decay of intensity arising from loss of particles in the ring, and the intrinsic limitation in pulse repetition rate. The particular combination of features that makes SR a superior light source depends upon the application. Spectroscopic techniques based on absorption and some techniques based on emission exploit its intensity and continuous tunability; time resolved techniques make use of its pulse characteristics. This chapter is a status report on two of the major biological applications of UV SR, circular dichroism and time-resolved fluorescence, covering mainly the published literature of the last five years. For the present purpose, the term UV is understood to include the vacuum ultraviolet region to 100 nm. (author). 83 refs.; 4 figs.; 6 tabs

  12. Three-dimensional particle tracking in concave structures made by ultraviolet nanoimprint via total internal reflection fluorescence microscopy and refractive-index-matching method

    Science.gov (United States)

    Fujinami, Taku; Kigami, Hiroshi; Unno, Noriyuki; Taniguchi, Jun; Satake, Shin-ichi

    2018-03-01

    Total internal reflection fluorescence microscopy (TIRFM) is a promising method for measuring fluid flow close to a wall with nanoscale resolution in a process that is termed "multilayer nanoparticle image velocimetry" (MnPIV). TIRFM uses evanescent light that is generated on a substrate (typically a glass slide) by total internal reflection of light. Many researchers have previously studied x-y-z (3D) flows of water close to flat glass slides using MnPIV. On the other hand, a fluid flow close to a structured surface is also important. To measure flows of water near micro-patterns, we previously developed an MnPIV technique that uses a refractive-index-matching method. In previous study, the micropattern is made of a thermoplastic material with a refractive index that closely matches that of water. In this study, ultraviolet nanoimprint lithography was used for fabricating the appropriate micro-patterns because this technique can fabricate a pattern with a high resolution. As a result, we succeeded in performing MnPIV in water with a circular hole array pattern made by ultraviolet nanoimprint using a refractive-index-matching method. We believe that this technique will be helpful in elucidating fluid flows around microstructures.

  13. Biobased Nanoparticles for Broadband UV Protection with Photostabilized UV Filters

    NARCIS (Netherlands)

    Hayden, D.R.|info:eu-repo/dai/nl/412640694; Imhof, A.|info:eu-repo/dai/nl/145641600; Velikov, K. P.|info:eu-repo/dai/nl/239483472

    2016-01-01

    Sunscreens rely on multiple compounds to provide effective and safe protection against UV radiation. UV filters in sunscreens, in particular, provide broadband UV protection but are heavily linked to adverse health effects due to the generation of carcinogenic skin-damaging reactive oxygen species

  14. Contact Dermatitis in Pediatrics.

    Science.gov (United States)

    Pelletier, Janice L; Perez, Caroline; Jacob, Sharon E

    2016-08-01

    Contact dermatitis is an umbrella term that describes the skin's reaction to contacted noxious or allergenic substances. The two main categories of contact dermatitis are irritant type and allergic type. This review discusses the signs, symptoms, causes, and complications of contact dermatitis. It addresses the testing, treatment, and prevention of contact dermatitis. Proper management of contact dermatitis includes avoidance measures for susceptible children. Implementation of a nickel directive (regulating the use of nickel in jewelry and other products that come into contact with the skin) could further reduce exposure to the most common allergens in the pediatric population. [Pediatr Ann. 2016;45(8):e287-e292.]. Copyright 2016, SLACK Incorporated.

  15. Surface properties of UV irradiated PC–TiO{sub 2} nanocomposite film

    Energy Technology Data Exchange (ETDEWEB)

    Jaleh, B., E-mail: bkjaleh@yahoo.com; Shahbazi, N.

    2014-09-15

    Highlights: • Production of PC–TiO{sub 2} nanocomposite films. • Fully characterization of PC–TiO{sub 2} nanocomposite films. • Influence of UV irradiation on surface properties and hardness of PC–TiO{sub 2} nanocomposite film. - Abstract: In this work, polycarbonate–TiO{sub 2} nanocomposite films were prepared with two different percentages. The structure of samples were studied by X-ray diffraction. Thermal stability of the nanocomposites was studied by thermogravimetric analysis (TGA). The polycarbonate and polycarbonate–TiO{sub 2} nanocomposite films were exposed by UV light at different irradiation times. The effects of UV irradiation on the surface properties of samples have been studied by different characterization techniques, viz. scanning electron microscopy (SEM), FTIR spectroscopy, X-ray photoelectron spectroscopy (XPS), contact angle measurement and Vickers microhardness tester. Hydrophilicity and surface energy of UV treated samples varied depending on UV irradiation time. TGA curves showed that nanocomposite films have higher resistance to thermal degradation compared to polycarbonate. XPS analysis shows that surface of samples become more oxidized due to UV irradiation. For nanocomposite film, the smallest contact angle was observed in association with the longest UV irradiation time. The contact angle significantly decreased from 90° to 12° after 15 h of UV irradiation. It is observed that the hardness of the nanocomposite films increases after UV irradiation.

  16. Standardization of UV LED measurements

    Science.gov (United States)

    Eppeldauer, G. P.; Larason, T. C.; Yoon, H. W.

    2015-09-01

    Traditionally used source spectral-distribution or detector spectral-response based standards cannot be applied for accurate UV LED measurements. Since the CIE standardized rectangular-shape spectral response function for UV measurements cannot be realized with small spectral mismatch when using filtered detectors, the UV measurement errors can be several times ten percent or larger. The UV LEDs produce broadband radiation and both their peaks or spectral bandwidths can change significantly. The detectors used for the measurement of these LEDs also have different spectral bandwidths. In the discussed example, where LEDs with 365 nm peak are applied for fluorescent crack-recognition using liquid penetrant (non-destructive) inspection, the broadband radiometric LED (signal) measurement procedure is standardized. A UV LED irradiance-source was calibrated against an FEL lamp standard to determine its spectral irradiance. The spectral irradiance responsivity of a reference UV meter was also calibrated. The output signal of the reference UV meter was calculated from the spectral irradiance of the UV source and the spectral irradiance responsivity of the reference UV meter. From the output signal, both the integrated irradiance (in the reference plane of the reference meter) and the integrated responsivity of the reference meter were determined. Test UV meters calibrated for integrated responsivity against the reference UV meter, can be used to determine the integrated irradiance from a field UV source. The obtained 5 % (k=2) measurement uncertainty can be decreased when meters with spectral response close to a constant value are selected.

  17. Health hazards of UV radiation

    International Nuclear Information System (INIS)

    Matthes, R.

    1994-01-01

    The author describes the effects and health risks of UV exposure. This includes UV effects on the DNS, the eyes, the immune system, and the skin. Finally, recommendations are given for protection against excessive UV exposure on the basis of the IRPA/INIRC guidelines. (orig.) [de

  18. Transverse effects in UV FELs

    International Nuclear Information System (INIS)

    Small, D.W.; Wong, R.K.; Colson, W.B.

    1995-01-01

    In an ultraviolet Free Electron Laser (UV FEL), the electron beam size can be approximately the same as the optical mode size. The performance of a UV FEL is studied including the effect of emittance, betatron focusing, and external focusing of the electron beam on the transverse optical mode. The results are applied to the Industrial Laser Consortium's UV FEL

  19. Antibacterial effects of the artificial surface of nanoimprinted moth-eye film.

    Directory of Open Access Journals (Sweden)

    Kiyoshi Minoura

    Full Text Available The antibacterial effect of a nanostructured film, known as "moth-eye film," was investigated. The moth-eye film has artificially formed nano-pillars, consisting of hydrophilic resin with urethane acrylate and polyethylene glycol (PEG derivatives, all over its surface that replicates a moth's eye. Experiments were performed to compare the moth-eye film with a flat-surfaced film produced from the same materials. The JIS Z2801 film-covering method revealed that the two films produced a decrease in Staphylococcus aureus and Esherichia coli titers of over 5 and 3 logs, respectively. There was no marked difference in the antibacterial effects of the two surfaces. However, the antibacterial effects were reduced by immersion of the films in water. These results indicated that a soluble component(s of the resin possessed the antibacterial activity, and this component was identified as PEG derivatives by time-of-flight secondary ion mass spectrometry (TOF-SIMS and Fourier transform infrared spectroscopy (FT-IR. When a small volume of bacterial suspension was dropped on the films as an airborne droplet model, both films showed antibacterial effects, but that of the moth-eye film was more potent. It was considered that the moth-eye structure allowed the bacteria-loaded droplet to spread and allow greater contact between the bacteria and the film surface, resulting in strong adherence of the bacteria to the film and synergistically enhanced bactericidal activity with chemical components. The antibacterial effect of the moth-eye film has been thus confirmed under a bacterial droplet model, and it appears attractive due to its antibacterial ability, which is considered to result not only from its chemical make-up but also from physical adherence.

  20. Chemical and UV Mutagenesis.

    Science.gov (United States)

    Bose, Jeffrey L

    2016-01-01

    The ability to create mutations is an important step towards understanding bacterial physiology and virulence. While targeted approaches are invaluable, the ability to produce genome-wide random mutations can lead to crucial discoveries. Transposon mutagenesis is a useful approach, but many interesting mutations can be missed by these insertions that interrupt coding and noncoding sequences due to the integration of an entire transposon. Chemical mutagenesis and UV-based random mutagenesis are alternate approaches to isolate mutations of interest with the potential of only single nucleotide changes. Once a standard method, difficulty in identifying mutation sites had decreased the popularity of this technique. However, thanks to the recent emergence of economical whole-genome sequencing, this approach to making mutations can once again become a viable option. Therefore, this chapter provides an overview protocol for random mutagenesis using UV light or DNA-damaging chemicals.

  1. UV curable materials development

    Energy Technology Data Exchange (ETDEWEB)

    Parker, B.G.

    1996-12-01

    Adhesives, coatings, and inks were selected for evaluation based on literature search and possible production applications. A differential photocalorimeter was used to measure degree of cure and allow prediction of optimum processing conditions. UV cure equipment were characterized and the ability to size equipment to specific materials cure needs established. Adhesion tests procedures were developed for the adhesives and solvent resistance testing procedures developed for the coatings and inks.

  2. Water and Wastewater Disinfection with Peracetic Acid and UV Radiation and Using Advanced Oxidative Process PAA/UV

    Directory of Open Access Journals (Sweden)

    Jeanette Beber de Souza

    2015-01-01

    Full Text Available The individual methods of disinfection peracetic acid (PAA and UV radiation and combined process PAA/UV in water (synthetic and sanitary wastewater were employed to verify the individual and combined action of these advanced oxidative processes on the effectiveness of inactivation of microorganisms indicators of fecal contamination E. coli, total coliforms (in the case of sanitary wastewater, and coliphages (such as virus indicators. Under the experimental conditions investigated, doses of 2, 3, and 4 mg/L of PAA and contact time of 10 minutes and 60 and 90 s exposure to UV radiation, the results indicated that the combined method PAA/UV provided superior efficacy when compared to individual methods of disinfection.

  3. Contact mechanics: contact area and interfacial separation from small contact to full contact

    International Nuclear Information System (INIS)

    Yang, C; Persson, B N J

    2008-01-01

    We present a molecular dynamics study of the contact between a rigid solid with a randomly rough surface and an elastic block with a flat surface. The numerical calculations mainly focus on the contact area and the interfacial separation from small contact (low load) to full contact (high load). For a small load the contact area varies linearly with the load and the interfacial separation depends logarithmically on the load. For a high load the contact area approaches the nominal contact area (i.e. complete contact), and the interfacial separation approaches zero. The numerical results have been compared with analytical theory and experimental results. They are in good agreement with each other. The present findings may be very important for soft solids, e.g. rubber, or for very smooth surfaces, where complete contact can be reached at moderately high loads without plastic deformation of the solids

  4. UV Radiation and the Skin

    Directory of Open Access Journals (Sweden)

    Timothy Scott

    2013-06-01

    Full Text Available UV radiation (UV is classified as a “complete carcinogen” because it is both a mutagen and a non-specific damaging agent and has properties of both a tumor initiator and a tumor promoter. In environmental abundance, UV is the most important modifiable risk factor for skin cancer and many other environmentally-influenced skin disorders. However, UV also benefits human health by mediating natural synthesis of vitamin D and endorphins in the skin, therefore UV has complex and mixed effects on human health. Nonetheless, excessive exposure to UV carries profound health risks, including atrophy, pigmentary changes, wrinkling and malignancy. UV is epidemiologically and molecularly linked to the three most common types of skin cancer, basal cell carcinoma, squamous cell carcinoma and malignant melanoma, which together affect more than a million Americans annually. Genetic factors also influence risk of UV-mediated skin disease. Polymorphisms of the melanocortin 1 receptor (MC1R gene, in particular, correlate with fairness of skin, UV sensitivity, and enhanced cancer risk. We are interested in developing UV-protective approaches based on a detailed understanding of molecular events that occur after UV exposure, focusing particularly on epidermal melanization and the role of the MC1R in genome maintenance.

  5. coating layers under the UV loading

    Directory of Open Access Journals (Sweden)

    Kulhavý Petr

    2017-01-01

    Full Text Available For individual components as well as for the final products is need to determine their resistance and other mechanical properties, which can be changing due to the various conditions and simultaneously we try to get still closer to the real operating conditions.Currently, given the need to guarantee a perfect quality of the product throughout its entire life cycle, it is necessary to assess the protective layers that are in direct contact with the material itself or with the future products.This article presents the results of testing individual components of the selected materials and their resistance to the UV rays. These were some samples of a prelacquered sheet and a powder coated plate after their forming, next by pigment colored concrete cubes, artificial wood and a prototype sample of the translucent material Licrete. Compared to a conventional climate tests such as heat, cold, humidity or the salt chambers, the colored protection layers were subjected to a strong UV rays. Subsequently was evaluated the change of the colors, brightness and where it was possible also the adhesion parameters and thickness of the coated layer. The measurement wasn’t focused only on the adhesion and color stability, but also to a violation of microstructure due to high temperatures caused by the UV ray. The selected specimens were tested in a device which simulates solar radiation and then were them evaluated the changes of a colors and on the surface structure.

  6. uvsI mutants defective in UV mutagenesis define a fourth epistatic group of uvs genes in Aspergillus.

    Science.gov (United States)

    Chae, S K; Kafer, E

    1993-01-01

    Three UV-sensitive mutations of A. nidulans, uvsI, uvsJ and uvsA, were tested for epistatic relationships with members of the previously established groups, here called the "UvsF", "UvsC", and "UvsB" groups. uvsI mutants are defective for spontaneous and induced reversion of certain point mutations and differ also for other properties from previously analyzed uvs types. They are very sensitive to the killing effects of UV-light and 4-NQO (4-nitro-quinoline-N-oxide) but not to MMS (methylmethane sulfonate). When double- and single-mutant uvs strains were compared for sensitivity to these three agents, synergistic or additive effects were found for uvsI with all members of the three groups. The uvsI gene may therefore represent a fourth epistatic group, possibly involved in mutagenic repair. On the other hand, uvsJ was clearly epistatic with members of the UvsF group and fitted well into this group also by phenotype. The uvsA gene was tentatively assigned to the UvsC group. uvsA showed epistatic interactions with uvsC in all tests, and like UvsC-group mutants is UV-sensitive mainly in dividing cells. However, the uvsA mutation does not cause the defects in recombination and UV mutagenesis typical for this group.

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Cleveland. "This is far from the truth." Real People, Real Problems with Colored Contact Lenses Julian: Teenager ... about the members of the eye-care team . Consumer warning about the improper use of colored contact ...

  8. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... One Use Facts About Colored Contacts and Halloween Safety Colored Contact Lens Facts Over-the-Counter Costume ... new application of artificial intelligence shows whether a patient’s eyes point to high blood pressure or risk ...

  9. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Costume Contacts May Contain Chemicals Harmful to Eyes Four Ways Over-the-Counter Costume Contact Lenses Can ... was in severe pain and on medication for four weeks, and couldn't see well enough to ...

  10. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... sell contacts without a prescription are breaking the law, and may be fined $11,000 per violation. " ... wear any kind of contact lens. In Butler's case, the lenses caused an infection and left her ...

  11. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Hazard: The Hidden Dangers of Buying Decorative Contact Lenses Without a Prescription Leer en Español: Peligros asociados ... truth." Real People, Real Problems with Colored Contact Lenses Julian: Teenager Blinded In One Eye By Non- ...

  12. Colored Contact Lens Dangers

    Science.gov (United States)

    ... Hazard: The Hidden Dangers of Buying Decorative Contact Lenses Without a Prescription Leer en Español: Peligros asociados ... truth." Real People, Real Problems with Colored Contact Lenses Julian: Teenager Blinded In One Eye By Non- ...

  13. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Cleveland. "This is far from the truth." Real People, Real Problems with Colored Contact Lenses Julian: Teenager ... the lenses. Never share contact lenses with another person. Get follow up exams with your eye care ...

  14. Contact Angle Goniometer

    Data.gov (United States)

    Federal Laboratory Consortium — Description:The FTA32 goniometer provides video-based contact angle and surface tension measurement. Contact angles are measured by fitting a mathematical expression...

  15. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... like a suction cup." Halloween is a popular time for people to use colored contact lenses to ... wear costume contact lenses for Halloween or any time of year, follow these guidelines: Get an eye ...

  16. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... glow-in-the-dark lizard lenses, costume contacts can certainly add a spooky, eye-popping touch. But ... consideration as a standard contact lens because they can be purchased over-the-counter or on the ...

  17. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are considering ... Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at ...

  18. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... not require the same level of care or consideration as a standard contact lens because they can ... sell contacts without a prescription are breaking the law, and may be fined $11,000 per violation. " ...

  19. Dermatitis, contact (image)

    Science.gov (United States)

    This picture shows a skin inflammation (dermatitis) caused by contact with a material that causes an allergic reaction in this person. Contact dermatitis is a relatively common condition, and can be caused ...

  20. Contact materials for nanoelectronics

    KAUST Repository

    Alshareef, Husam N.; Quevedo-Ló pez, Manuel Angel Quevedo; Majhi, Prashant

    2011-01-01

    In this article, we review current research activities in contact material development for electronic and nanoelectronic devices. A fundamental issue in contact materials research is to understand and control interfacial reactions and phenomena

  1. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... the United States. All contact lenses are medical devices that require a prescription and proper fitting by an eye-care professional. Retailers that sell contacts without a ...

  2. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... prescription. Follow the contact lens care directions for cleaning, disinfecting, and wearing the lenses. Never share contact ... with Industry Medical Disclaimer Privacy Policy Terms of Service For Advertisers For Media Ophthalmology Job Center © American ...

  3. Contact Lens Risks

    Science.gov (United States)

    ... There is a risk of eye infection from bacteria in swimming pool water, hot tubs, lakes and the ocean Replace your contact lens storage case every 3 months or as directed by your eye care professional. Other Risks of Contact Lenses Other risks of contact lenses include pink eye ( ...

  4. Hydrogenation of passivated contacts

    Energy Technology Data Exchange (ETDEWEB)

    Nemeth, William; Yuan, Hao-Chih; LaSalvia, Vincenzo; Stradins, Pauls; Page, Matthew R.

    2018-03-06

    Methods of hydrogenation of passivated contacts using materials having hydrogen impurities are provided. An example method includes applying, to a passivated contact, a layer of a material, the material containing hydrogen impurities. The method further includes subsequently annealing the material and subsequently removing the material from the passivated contact.

  5. Mixed Lubricated Line Contacts

    NARCIS (Netherlands)

    Faraon, I.C.

    2005-01-01

    The present work deals with friction in mixed lubricated line contacts. Components in systems are becoming smaller and due to, for instance power transmitted, partial contact may occur. In industrial applications, friction between the moving contacting surfaces cannot be avoided, therefore it is

  6. New Cosmetic Contact Allergens

    Directory of Open Access Journals (Sweden)

    An Goossens

    2015-02-01

    Full Text Available Allergic and photo-allergic contact dermatitis, and immunologic contact urticaria are potential immune-mediated adverse effects from cosmetics. Fragrance components and preservatives are certainly the most frequently observed allergens; however, all ingredients must be considered when investigating for contact allergy.

  7. Uvs Nuur, Mongolia

    Science.gov (United States)

    2007-01-01

    The Uvs Nuur Basin in Mongolia and the Russian Federation is the northernmost of the enclosed basins of Central Asia. It takes its name from Uvs Nuur Lake, a large, shallow and very saline lake, very important for migrating birds. Inscribed as a UNESCO World Heritage Site in 2003, the site is made up of twelve protected areas representing major biomes of eastern Eurasia. The steppe ecosystem supports a rich diversity of birds and the desert is home to a number of rare gerbil, jerboas and the marbled polecat. The mountains are an important refuge for the endangered snow leopard, mountain sheep, and the Asiatic ibex. The image covers an area of 46 x 47.8 km, was acquired on September 4, 2001, and is located near 50.3 degrees north latitude, 90.7 degrees east longitude. The U.S. science team is located at NASA's Jet Propulsion Laboratory, Pasadena, Calif. The Terra mission is part of NASA's Science Mission Directorate.

  8. Contact Aligner 1 (Front and Back Side): Suss Microtec MA6

    Data.gov (United States)

    Federal Laboratory Consortium — Description:CORAL Name: SussMA6This system utilizes 1X contact lithography to transfer photomask patterns onto substrates Specifications / Capabilities:UV broadmand...

  9. Modification of rubber surface by UV surface grafting

    International Nuclear Information System (INIS)

    Shanmugharaj, A.M.; Kim, Jin Kuk; Ryu, Sung Hun

    2006-01-01

    Rubber surface is subjected to ultraviolet radiation (UV) in the presence of allylamine and radiation sensitizer benzophenone (BP). Fourier transform infrared spectral studies reveal the presence of allylamine on the surface. The presence of irregular needle shapes on the surface as observed in scanning electron micrographs also confirms the polymerized allylamine on the surface. Allylamine coatings have been further confirmed from atomic force microscopy (AFM) analysis. Thermogravimetric analysis (TGA) reveals that allylamine coating on the rubber surface lowers the thermal degradation rate. The contact angle between the water and rubber surface decreases for the modified rubber surface confirming the surface modification due to UV surface grafting

  10. CUVE - Cubesat UV Experiment: Unveil Venus' UV Absorber with Cubesat UV Mapping Spectrometer

    Science.gov (United States)

    Cottini, V.; Aslam, S.; D'Aversa, E.; Glaze, L.; Gorius, N.; Hewagama, T.; Ignatiev, N.; Piccioni, G.

    2017-09-01

    Our Venus mission concept Cubesat UV Experiment (CUVE) is one of ten proposals selected for funding by the NASA PSDS3 Program - Planetary Science Deep Space SmallSat Studies. CUVE concept is to insert a CubeSat spacecraft into a Venusian orbit and perform remote sensing of the UV spectral region using a high spectral resolution point spectrometer to resolve UV molecular bands, observe nightglow, and characterize the unidentified main UV absorber. The UV spectrometer is complemented by an imaging UV camera with multiple bands in the UV absorber main band range for contextual imaging. CUVE Science Objectives are: the nature of the "Unknown" UV-absorber; the abundances and distributions of SO2 and SO at and above Venus's cloud tops and their correlation with the UV absorber; the atmospheric dynamics at the cloud tops, structure of upper clouds and wind measurements from cloud-tracking; the nightglow emissions: NO, CO, O2. This mission will therefore be an excellent platform to study Venus' cloud top atmospheric properties where the UV absorption drives the planet's energy balance. CUVE would complement past, current and future Venus missions with conventional spacecraft, and address critical science questions cost effectively.

  11. CONTACT RESISTANCE MODELING

    Directory of Open Access Journals (Sweden)

    S. V. LOSKUTOV

    2018-05-01

    Full Text Available Purpose. To determine the contribution of the real contact spots distribution in the total conductivity of the conductors contact. Methodology. The electrical contact resistance research was carried out on models. The experimental part of this work was done on paper with a graphite layer with membranes (the first type and conductive liquids with discrete partitions (the second type. Findings. It is shown that the contact electrical resistance is mainly determined by the real area of metal contact. The experimental dependence of the electrical resistance of the second type model on the distance between the electrodes and the potential distribution along the sample surface for the first type model were obtained. The theoretical model based on the principle of electric field superposition was considered. The dependences obtained experimentally and calculated by using the theoretical model are in good agreement. Originality. The regularity of the electrical contact resistance formation on a large number of membranes was researched for the first time. A new model of discrete electrical contact based on the liquid as the conducting environment with nuclear membrane partitions was developed. The conclusions of the additivity of contact and bulk electrical resistance were done. Practical value. Based on these researches, a new experimental method of kinetic macroidentation that as a parameter of the metal surface layer deformation uses the real contact area was developed. This method allows to determine the value of average contact stresses, yield point, change of the stress on the depth of deformation depending on the surface treatment.

  12. Skin Cancer and UV Protection

    Directory of Open Access Journals (Sweden)

    Tarbuk Anita

    2016-03-01

    Full Text Available The incidence of skin cancer is increasing by epidemic proportions. Basal cell cancer remains the most common skin neoplasm, and simple excision is generally curative. On the other hand, aggressive local growth and metastasis are common features of malignant melanoma, which accounts for 75% of all deaths associated with skin cancer. The primary cause of skin cancer is long exposure to solar ultraviolet radiation (UV-R crossed with the amount of skin pigmentation and family genetics. It is believed that in childhood and adolescence, 80% of UV-R gets absorbed while in the remaining, 20 % gets absorbed later in the lifetime. This suggests that proper and early photoprotection may reduce the risk of subsequent occurrence of skin cancer. Reducing the exposure time to sunlight, using sunscreens and protective textiles are the three ways of UV protection. Most people think that all the clothing will protect them, but it does not provide full sun screening properties. Literature sources claim that only 1/3 of the spring and summer collections tested give off proper UV protection. This is very important during the summer months, when UV index is the highest. Fabric UV protection ability highly depends on large number of factors such as type of fiber, fabric surface, construction, porosity, density, moisture content, type and concentration of dyestuff, fluorescent whitening agents, UV-B protective agents (UV absorbers, as well as nanoparticles, if applied. For all of these reasons, in the present paper, the results of UV protecting ability according to AS/NZS 4399:1996 will be discussed to show that standard clothing materials are not always adequate to prevent effect of UV-R to the human skin; and to suggest the possibilities for its improvement for this purpose enhancing light conversion and scattering. Additionally, the discrepancy in UV protection was investigated in distilled water as well as Adriatic Sea water.

  13. Contact and symplectic topology

    CERN Document Server

    Colin, Vincent; Stipsicz, András

    2014-01-01

    Symplectic and contact geometry naturally emerged from the mathematical description of classical physics. The discovery of new rigidity phenomena and properties satisfied by these geometric structures launched a new research field worldwide. The intense activity of many European research groups in this field is reflected by the ESF Research Networking Programme "Contact And Symplectic Topology" (CAST). The lectures of the Summer School in Nantes (June 2011) and of the CAST Summer School in Budapest (July 2012) provide a nice panorama of many aspects of the present status of contact and symplectic topology. The notes of the minicourses offer a gentle introduction to topics which have developed in an amazing speed in the recent past. These topics include 3-dimensional and higher dimensional contact topology, Fukaya categories, asymptotically holomorphic methods in contact topology, bordered Floer homology, embedded contact homology, and flexibility results for Stein manifolds.

  14. Introduction to contact mechanics

    CERN Document Server

    Fischer-Cripps, Anthony C

    2000-01-01

    Contact mechanics deals with the elastic or plastic contact between two solid objects, and is thus intimately connected with such topics as fracture, hardness, and elasticity.This text, intended for advanced undergraduates, begins with an introduction to the mechanical properties of materials, general fracture mechanics, and fractures in brittle solids.This is followed by a detailed discussion of stresses and the nature of elastic and elastic-plastic contact.

  15. Wettability modification of human tooth surface by water and UV and electron-beam radiation

    International Nuclear Information System (INIS)

    Tiznado-Orozco, Gaby E.; Reyes-Gasga, José; Elefterie, Florina; Beyens, Christophe; Maschke, Ulrich; Brès, Etienne F.

    2015-01-01

    The wettability of the human tooth enamel and dentin was analyzed by measuring the contact angles of a drop of distilled water deposited on the surface. The samples were cut along the transverse and longitudinal directions, and their surfaces were subjected to metallographic mirror-finish polishing. Some samples were also acid etched until their microstructure became exposed. Wettability measurements of the samples were done in dry and wet conditions and after ultraviolet (UV) and electron beam (EB) irradiations. The results indicate that water by itself was able to increase the hydrophobicity of these materials. The UV irradiation momentarily reduced the contact angle values, but they recovered after a short time. EB irradiation raised the contact angle and maintained it for a long time. Both enamel and dentin surfaces showed a wide range of contact angles, from approximately 10° (hydrophilic) to 90° (hydrophobic), although the contact angle showed more variability on enamel than on dentin surfaces. Whether the sample's surface had been polished or etched did not influence the contact angle value in wet conditions. - Highlights: • Human tooth surface wettability changes in dry/wet and UV/EB radiation conditions. • More variability in contact angle is observed on enamel than on dentin surfaces. • Water by itself increases the hydrophobicity of the human tooth surface. • UV irradiation reduces momentarily the human tooth surface hydrophobicity. • EB irradiation increases and maintains the hydrophobicity for a long time

  16. Wettability modification of human tooth surface by water and UV and electron-beam radiation

    Energy Technology Data Exchange (ETDEWEB)

    Tiznado-Orozco, Gaby E., E-mail: gab0409@gmail.com [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Unidad Académica de Odontología, Universidad Autónoma de Nayarit, Edificio E7, Ciudad de la Cultura “Amado Nervo”, C.P. 63190 Tepic, Nayarit (Mexico); Reyes-Gasga, José, E-mail: jreyes@fisica.unam.mx [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Instituto de Física, UNAM, Circuito de la Investigación s/n, Ciudad Universitaria, 04510 Coyoacan, México, D.F. (Mexico); Elefterie, Florina, E-mail: elefterie_florina@yahoo.com [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Beyens, Christophe, E-mail: christophe.beyens@ed.univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Maschke, Ulrich, E-mail: Ulrich.Maschke@univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Brès, Etienne F., E-mail: etienne.bres@univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France)

    2015-12-01

    The wettability of the human tooth enamel and dentin was analyzed by measuring the contact angles of a drop of distilled water deposited on the surface. The samples were cut along the transverse and longitudinal directions, and their surfaces were subjected to metallographic mirror-finish polishing. Some samples were also acid etched until their microstructure became exposed. Wettability measurements of the samples were done in dry and wet conditions and after ultraviolet (UV) and electron beam (EB) irradiations. The results indicate that water by itself was able to increase the hydrophobicity of these materials. The UV irradiation momentarily reduced the contact angle values, but they recovered after a short time. EB irradiation raised the contact angle and maintained it for a long time. Both enamel and dentin surfaces showed a wide range of contact angles, from approximately 10° (hydrophilic) to 90° (hydrophobic), although the contact angle showed more variability on enamel than on dentin surfaces. Whether the sample's surface had been polished or etched did not influence the contact angle value in wet conditions. - Highlights: • Human tooth surface wettability changes in dry/wet and UV/EB radiation conditions. • More variability in contact angle is observed on enamel than on dentin surfaces. • Water by itself increases the hydrophobicity of the human tooth surface. • UV irradiation reduces momentarily the human tooth surface hydrophobicity. • EB irradiation increases and maintains the hydrophobicity for a long time.

  17. UV imaging in pharmaceutical analysis

    DEFF Research Database (Denmark)

    Østergaard, Jesper

    2018-01-01

    UV imaging provides spatially and temporally resolved absorbance measurements, which are highly useful in pharmaceutical analysis. Commercial UV imaging instrumentation was originally developed as a detector for separation sciences, but the main use is in the area of in vitro dissolution...

  18. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... also available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial ...

  19. Allergic Contact Dermatitis

    Directory of Open Access Journals (Sweden)

    Meltem Önder

    2009-03-01

    Full Text Available Allergic contact dermatitis is the delayed type hypersensitivity reaction to exogenous agents. Allergic contact dermatitis may clinically present acutely after allergen exposure and initial sensitization in a previously sensitized individual. Acute phase is characterized by erythematous, scaly plaques. In severe cases vesiculation and bullae in exposed areas are very characteristic. Repeated or continuous exposure of sensitized individual with allergen result in chronic dermatitis. Lichenification, erythematous plaques, hyperkeratosis and fissuring may develop in chronic patients. Allergic contact dermatitis is very common dermatologic problem in dermatology daily practice. A diagnosis of contact dermatitis requires the careful consideration of patient history, physical examination and patch testing. The knowledge of the clinical features of the skin reactions to various contactans is important to make a correct diagnosis of contact dermatitis. It can be seen in every age, in children textile product, accessories and touch products are common allergens, while in adults allergic contact dermatitis may be related with topical medicaments. The contact pattern of contact dermatitis depends on fashion and local traditions as well. The localization of allergic reaction should be evaluated and patients’ occupation and hobbies should be asked. The purpose of this review is to introduce to our collaques up dated allergic contact dermatitis literatures both in Turkey and in the World.

  20. Colors and contact dermatitis.

    Science.gov (United States)

    Bonamonte, Domenico; Foti, Caterina; Romita, Paolo; Vestita, Michelangelo; Angelini, Gianni

    2014-01-01

    The diagnosis of skin diseases relies on several clinical signs, among which color is of paramount importance. In this review, we consider certain clinical presentations of both eczematous and noneczematous contact dermatitis in which color plays a peculiar role orientating toward the right diagnosis. The conditions that will be discussed include specific clinical-morphologic subtypes of eczematous contact dermatitis, primary melanocytic, and nonmelanocytic contact hyperchromia, black dermographism, contact chemical leukoderma, and others. Based on the physical, chemical, and biologic factors underlying a healthy skin color, the various skin shades drawing a disease picture are thoroughly debated, stressing their etiopathogenic origins and histopathologic aspects.

  1. The mechanisms of UV mutagenesis

    International Nuclear Information System (INIS)

    Ikehata, Hironobu; Ono, Tetsuya

    2011-01-01

    Ultraviolet (UV) light induces specific mutations in the cellular and skin genome such as UV-signature and triplet mutations, the mechanism of which has been thought to involve translesion DNA synthesis (TLS) over UV-induced DNA base damage. Two models have been proposed: ''error-free'' bypass of deaminated cytosine-containing cyclobutane pyrimidine dimers (CPDs) by DNA polymerase η, and error-prone bypass of CPDs and other UV-induced photolesions by combinations of TLS and replicative DNA polymerases-the latter model has also been known as the two-step model, in which the cooperation of two (or more) DNA polymerases as misinserters and (mis)extenders is assumed. Daylight UV induces a characteristic UV-specific mutation, a UV-signature mutation occurring preferentially at methyl-CpG sites, which is also observed frequently after exposure to either UVB or UVA, but not to UVC. The wavelengths relevant to the mutation are so consistent with the composition of daylight UV that the mutation is called solar-UV signature, highlighting the importance of this type of mutation for creatures with the cytosine-methylated genome that are exposed to the sun in the natural environment. UVA has also been suggested to induce oxidative types of mutation, which would be caused by oxidative DNA damage produced through the oxidative stress after the irradiation. Indeed, UVA produces oxidative DNA damage not only in cells but also in skin, which, however, does not seem sufficient to induce mutations in the normal skin genome. In contrast, it has been demonstrated that UVA exclusively induces the solar-UV signature mutations in vivo through CPD formation. (author)

  2. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... eye-care professional. Retailers that sell contacts without a prescription are breaking the law, and may be fined $11,000 per violation. "Many of the lenses found online or in beauty salons, novelty shops or in pop-up ... contact lenses from a retailer that does not ask for a prescription. ...

  3. Electric contact arcing

    International Nuclear Information System (INIS)

    Cuthrell, R.E.

    1976-01-01

    Electrical contacts must function properly in many types of components used in nuclear weapon systems. Design, application, and testing of these components require detailed knowledge of chemical and physical phenomena associated with stockpile storage, stockpile testing, and operation. In the past, investigation of these phenomena has led to significant discoveries on the effects of surface contaminants, friction and wear, and the mechanics of closure on contact performance. A recent investigation of contact arcing phenomena which revealed that, preceding contact closure, arcs may occur at voltages lower than had been previously known is described. This discovery is important, since arcing may damage contacts, and repetitive testing of contacts performed as part of a quality assurance program might produce cumulative damage that would yield misleading life-test data and could prevent proper operation of the contacts at some time in the future. This damage can be avoided by determining the conditions under which arcing occurs, and ensuring that these conditions are avoided in contact testing

  4. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Get follow up exams with your eye care provider. If you notice redness, swelling, excessive discharge, pain or discomfort from wearing contact lenses, remove the lenses and seek immediate medical attention from an ophthalmologist. Related resources: Learn how to properly care for contact lenses . ...

  5. Sciences & Nature: Contact

    African Journals Online (AJOL)

    Principal Contact. Ehouan Etienne Ehile Professor University of Abobo-Adjamé 02 BP 801 Abidjan 02. Phone: (+225) 2030 4201. Fax: (+225) 2030 4203. Email: eh_ehile@yahoo.fr. Support Contact. Irie Zoro Bi Email: banhiakalou@yahoo.fr. ISSN: 1812-0741. AJOL African Journals Online. HOW TO USE AJOL.

  6. Contact Us | DOepatents

    Science.gov (United States)

    advance. Your help is appreciated. Contact us by email Email doepatentscomments@osti.gov NOTE: Email us by phone Phone Phone (865) 241-5275 Contact us in writing Mail U.S. Department of Energy Office of non-federal websites. Their policies may differ from this site. Javascript Not Enabled Email Link

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... eye-care team . Consumer warning about the improper use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are considering buying approved by the FDA? Check the FDA's database of approved contact lenses . Related Stories Prevent Infection ...

  8. Contact dermatitis. A review

    DEFF Research Database (Denmark)

    Andersen, Klaus Ejner; Benezra, C; Burrows, D

    1987-01-01

    In recent years, there has been a dramatic rise in our understanding of contact dermatitis. This paper is a review of our knowledge of the mechanisms involved in contact dermatitis and related phenomena, the investigation of these events and the emergence of significant new allergens during...

  9. Contact Hamiltonian mechanics

    Energy Technology Data Exchange (ETDEWEB)

    Bravetti, Alessandro, E-mail: alessandro.bravetti@iimas.unam.mx [Instituto de Investigaciones en Matemáticas Aplicadas y en Sistemas, Universidad Nacional Autónoma de México, A. P. 70543, México, DF 04510 (Mexico); Cruz, Hans, E-mail: hans@ciencias.unam.mx [Instituto de Ciencias Nucleares, Universidad Nacional Autónoma de México, A. P. 70543, México, DF 04510 (Mexico); Tapias, Diego, E-mail: diego.tapias@nucleares.unam.mx [Facultad de Ciencias, Universidad Nacional Autónoma de México, A.P. 70543, México, DF 04510 (Mexico)

    2017-01-15

    In this work we introduce contact Hamiltonian mechanics, an extension of symplectic Hamiltonian mechanics, and show that it is a natural candidate for a geometric description of non-dissipative and dissipative systems. For this purpose we review in detail the major features of standard symplectic Hamiltonian dynamics and show that all of them can be generalized to the contact case.

  10. Contact Quality in Participation

    DEFF Research Database (Denmark)

    Simonsen, Jesper; Jensen, Olav Storm

    2016-01-01

    We investigate the concept of participation from the perspective of quality of the contact in the communicative interactions between participants. We argue for the need for an academic-personal competence that qualifies the human contact central in all Participatory Design (PD) activities as a way...

  11. Nigerian Food Journal: Contact

    African Journals Online (AJOL)

    Nigerian Food Journal. ... Nigerian Food Journal: Contact. Journal Home > About the Journal > Nigerian Food Journal: Contact. Log in or Register to get access to full text downloads. ... Mailing Address. Department of Food Science and Technology University of Agriculture, Makurdi, Nigeria ...

  12. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... like a suction cup." Halloween is a popular time for people to use colored contact lenses to enhance their costumes. From ... MD, professor of ophthalmology at Case Western Reserve University in Cleveland. "This is far ... Use Facts About Colored Contacts and Halloween Safety Colored ...

  13. Contact materials for nanoelectronics

    KAUST Repository

    Alshareef, Husam N.

    2011-02-01

    In this article, we review current research activities in contact material development for electronic and nanoelectronic devices. A fundamental issue in contact materials research is to understand and control interfacial reactions and phenomena that modify the expected device performance. These reactions have become more challenging and more difficult to control as new materials have been introduced and as device sizes have entered the deep nanoscale. To provide an overview of this field of inquiry, this issue of MRS Bulletin includes articles on gate and contact materials for Si-based devices, junction contact materials for Si-based devices, and contact materials for alternate channel substrates (Ge and III-V), nanodevices. © 2011 Materials Research Society.

  14. Noneczematous Contact Dermatitis

    Science.gov (United States)

    Foti, Caterina; Vestita, Michelangelo; Angelini, Gianni

    2013-01-01

    Irritant or allergic contact dermatitis usually presents as an eczematous process, clinically characterized by erythematoedematovesicous lesions with intense itching in the acute phase. Such manifestations become erythematous-scaly as the condition progresses to the subacute phase and papular-hyperkeratotic in the chronic phase. Not infrequently, however, contact dermatitis presents with noneczematous features. The reasons underlying this clinical polymorphism lie in the different noxae and contact modalities, as well as in the individual susceptibility and the various targeted cutaneous structures. The most represented forms of non-eczematous contact dermatitis include the erythema multiforme-like, the purpuric, the lichenoid, and the pigmented kinds. These clinical entities must obviously be discerned from the corresponding “pure” dermatitis, which are not associated with contact with exogenous agents. PMID:24109520

  15. UV Photography Shows Hidden Sun Damage

    Science.gov (United States)

    ... mcat1=de12", ]; for (var c = 0; c UV photography shows hidden sun damage A UV photograph gives ... developing skin cancer and prematurely aged skin. Normal photography UV photography 18 months of age: This boy's ...

  16. Sun, UV Radiation and Your Eyes

    Science.gov (United States)

    ... Sunglasses Sun Smart UV Safety Infographic The Sun, UV Radiation and Your Eyes Leer en Español: El ... Aug. 28, 2014 Keep an Eye on Ultraviolet (UV) Safety Eye medical doctors (ophthalmologists) caution us that ...

  17. UV-induced skin damage

    International Nuclear Information System (INIS)

    Ichihashi, M.; Ueda, M.; Budiyanto, A.; Bito, T.; Oka, M.; Fukunaga, M.; Tsuru, K.; Horikawa, T.

    2003-01-01

    Solar radiation induces acute and chronic reactions in human and animal skin. Chronic repeated exposures are the primary cause of benign and malignant skin tumors, including malignant melanoma. Among types of solar radiation, ultraviolet B (290-320 nm) radiation is highly mutagenic and carcinogenic in animal experiments compared to ultraviolet A (320-400 nm) radiation. Epidemiological studies suggest that solar UV radiation is responsible for skin tumor development via gene mutations and immunosuppression, and possibly for photoaging. In this review, recent understanding of DNA damage caused by direct UV radiation and by indirect stress via reactive oxygen species (ROS) and DNA repair mechanisms, particularly nucleotide excision repair of human cells, are discussed. In addition, mutations induced by solar UV radiation in p53, ras and patched genes of non-melanoma skin cancer cells, and the role of ROS as both a promoter in UV-carcinogenesis and an inducer of UV-apoptosis, are described based primarily on the findings reported during the last decade. Furthermore, the effect of UV on immunological reaction in the skin is discussed. Finally, possible prevention of UV-induced skin cancer by feeding or topical use of antioxidants, such as polyphenols, vitamin C, and vitamin E, is discussed

  18. UV survival of human mycoplasmas

    International Nuclear Information System (INIS)

    Aoki, Shigeji; Ito, Shoko; Watanabe, Takehiko

    1979-01-01

    The inactivation by ultraviolet (UV) light irradiation of mycoplasma cells of five human strains was monitored by investigating the colony-forming ability. The survival curves of five strains tested indicated that the cells of Mycoplasma buccale only are single and homogenously susceptible to UV light. The effect of the repair inhibitor, caffeine, on the colony-forming ability of UV-irradiated cells was investigated with M. buccale because of its homogeneous susceptibility to UV light. The colony formation of irradiated cells was markedly depressed by post-irradiation treatment with caffeine at concentration that had little or no effect on the colony formation of unirradiated cells. The colony-forming units (CFU) of UV-irradiated cells which were kept in broth without caffeine in the dark increased without a lag as the time in the dark increased. The colony-forming ability of the irradiated cells completely recovered after 3 hr in the dark. However, when irradiated cells were kept in the presence of caffeine, no increase in their CFU was observed. The mode of action of caffeine on UV-irradiated cells closely resembles that described for other organisms which possess dark reactivation systems for UV-induced damage in deoxyribonucleic acid. Thus, the results obtained provide evidence for the existence of a dark repair function in M. buccale. (author)

  19. Wastewater disinfection alternatives: chlorine, ozone, peracetic acid, and UV light.

    Science.gov (United States)

    Mezzanotte, V; Antonelli, M; Citterio, S; Nurizzo, C

    2007-11-01

    Disinfection tests were carried out at pilot scale to compare the disinfection efficiency of ozone, sodium hypochlorite (NaOCl), peracetic acid (PAA), and UV irradiation. Total coliforms, fecal coliforms, and Escherichia coli were monitored as reference microorganisms. Total heterotrophic bacteria (THB) were also enumerated by cytometry. At similar doses, NaOCl was more effective than PAA, and its action was less affected by contact time. The results obtained by ozonation were comparable for total coliforms, fecal coliforms, and E. coli. On the contrary, some differences among the three indicators were observed for NaOCl, PAA, and UV. Differences increased with increasing values of the disinfectant concentration times contact time (C x t) and were probably the result of different initial counts, as total coliforms include fecal coliforms, which include E. coli. The UV irradiation lead to complete E. coli removals, even at low doses (10 to 20 mJ/cm2). Total heterotrophic bacteria appeared to be too wide a group to be a good disinfection indicator; no correlation was found among THB inactivation, dose, and contact time.

  20. EXOSAT and IUE observations of contact binaries

    International Nuclear Information System (INIS)

    Vilhu, O.; Heise, J.; Laboratorium voor Ruimteonderzoek, Utrecht, Netherlands)

    1986-01-01

    EXOSAT observations are reported of the contact binaries W UMa, VW Cep, 44t Boo, XY Leo, and V566 Oph and the detached short-period RS CVn stars ER Vul and HD 209943. Complete X-ray light curves were obtained for W UMa, VW Cep and 44t Boo. Nearly simultaneous IUE observations of VW Cep provide important comparisons of the Mg II emission, the UV continuum, and the FES light curve, pointing to extra hot gas at phase 0.75. The observations indicate that contact binaries have highly structured (in temperature and geometry) and highly variable coronae, not preferentially connected with either of the component stars. The observed dips can be interpreted as due to cool absorbing clouds above localized X-ray emitting regions. For VW Cep, 44t Boo, and XY Leo there is evidence that the neck regions are sites for X-ray-emitting hot gas. 66 references

  1. Aerosol effects on UV radiation

    International Nuclear Information System (INIS)

    Koepke, P.; Reuder, J.; Schwander, H.

    2000-01-01

    The reduction of erythemally weighted UV-irradiance (given as UV index, UVI) due to aerosols is analyzed by variation of the tropospheric particles in a wide, but realistic range. Varied are amount and composition of the particles and relative humidity and thickness of the mixing layer. The reduction of UVI increases with aerosol optical depth and the UV change is around 10% for a change aerosol optical depth from 0.25 to 0.1 and 0.4 respectively. Since both aerosol absorption and scattering are of relevance, the aerosol effect depends besides total aerosol amount on relative amount of soot and on relative humidity

  2. Contacts to semiconductors

    International Nuclear Information System (INIS)

    Tove, P.A.

    1975-08-01

    Contacts to semiconductors play an important role in most semiconductor devices. These devices range from microelectronics to power components, from high-sensitivity light or radiation detectors to light-emitting of microwave-generating components. Silicon is the dominating material but compound semiconductors are increasing in importance. The following survey is an attempt to classify contact properties and the physical mechanisms involved, as well as fabrication methods and methods of investigation. The main interest is in metal-semiconductor type contacts where a few basic concepts are dealt with in some detail. (Auth.)

  3. UV/EB curable psa's

    International Nuclear Information System (INIS)

    Glotfelter, C.A.

    1995-01-01

    The author describe both water-based and 100% solids UV/EB curable PSA's (Pressure Sensitive Adhesives) and their properties. A new acrylate monomer, ethoxylated nonyl phenol acrylate, has great utility in the formulation of water-based PSA's

  4. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... not been properly fitted by an eye care professional, the lenses stuck to my eye like a ... prescription and proper fitting by an eye-care professional. Retailers that sell contacts without a prescription are ...

  5. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... about the members of the eye-care team . Consumer warning about the improper use of colored contact ... About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms of ...

  6. Contact Line Dynamics

    Science.gov (United States)

    Kreiss, Gunilla; Holmgren, Hanna; Kronbichler, Martin; Ge, Anthony; Brant, Luca

    2017-11-01

    The conventional no-slip boundary condition leads to a non-integrable stress singularity at a moving contact line. This makes numerical simulations of two-phase flow challenging, especially when capillarity of the contact point is essential for the dynamics of the flow. We will describe a modeling methodology, which is suitable for numerical simulations, and present results from numerical computations. The methodology is based on combining a relation between the apparent contact angle and the contact line velocity, with the similarity solution for Stokes flow at a planar interface. The relation between angle and velocity can be determined by theoretical arguments, or from simulations using a more detailed model. In our approach we have used results from phase field simulations in a small domain, but using a molecular dynamics model should also be possible. In both cases more physics is included and the stress singularity is removed.

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses ... away without suffering an eye injury. However, the natural protective mechanisms of the eye – such as the ...

  8. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... about the members of the eye-care team . Consumer warning about the improper use of colored contact ... a laser pointer several times, according to a report published this month in the New England Journal ...

  9. SAM Technical Contacts

    Science.gov (United States)

    These technical contacts are available to help with questions regarding method deviations, modifications, sample problems or interferences, quality control requirements, the use of alternative methods, or the need to address analytes or sample types.

  10. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are ... this month in the New England Journal of Medicine. Unfortunately, this kind of injury is all too ...

  11. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... a souvenir shop, but 10 hours after she first put in a pair of colored contact lenses, ... APR 24, 2018 By Kate Rauch In a first, scientists in China have created artificial photoreceptors to ...

  12. GAS-FOVEAL CONTACT

    DEFF Research Database (Denmark)

    Alberti, Mark; la Cour, Morten

    2018-01-01

    PURPOSE: To compare gas-foveal contact in face-down positioning (FDP) and nonsupine positioning (NSP), to analyze causes of gas-foveal separation and to determine how gas-foveal contact affects clinical outcome after idiopathic macular hole repair. METHODS: Single center, randomized controlled...... study. Participants with an idiopathic macular hole were allocated to either FDP or NSP. Primary outcome was gas-foveal contact, calculated by analyzing positioning in relation to intraocular gas fill. Positioning was measured with an electronic device recording positioning for 72 hours postoperatively....... RESULTS: Positioning data were available for 33/35 in the FDP group and 35/37 in the NSP group, thus results are based on 68 analyzed participants. Median gas-foveal contact was 99.82% (range 73.6-100.0) in the FDP group and 99.57% (range 85.3-100.0) in the NSP group (P = 0.22). In a statistical model...

  13. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Sep. 26, 2013 It started as an impulsive buy from a souvenir shop, but 10 hours after ... are being sold illegally," Dr. Steinemann said. Never buy colored contact lenses from a retailer that does ...

  14. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses ... 2018 By Dan T. Gudgel Do you know what the difference is between ophthalmologists and optometrists? A ...

  15. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Halloween or any time of year, follow these guidelines: Get an eye exam from a licensed eye ... available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the ...

  16. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... contacto de color Sep. 26, 2013 It started as an impulsive buy from a souvenir shop, but ... require the same level of care or consideration as a standard contact lens because they can be ...

  17. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... seek immediate medical attention from an ophthalmologist. Related resources: Learn how to properly care for contact lenses . ... have given blind patients some functional vision, using human embryonic stem cells. Two blind patients regained enough ...

  18. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... that decorative lenses do not require the same level of care or consideration as a standard contact ... By Kate Rauch In a small but intriguing study, scientists in England have given blind patients some ...

  19. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... MD, professor of ophthalmology at Case Western Reserve University in Cleveland. "This is far from the truth." Real People, Real Problems with Colored Contact Lenses Julian: Teenager Blinded In ...

  20. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... also available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms ...

  1. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... lentes de contacto de color Sep. 26, 2013 It started as an impulsive buy from a souvenir ... Can Ruin Vision Eye Makeup Safety In fact, it is illegal to sell colored contact lenses without ...

  2. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... With Proper Contact Lens Care Apr 23, 2018 Solar Eclipse Inflicts Damage in the Shape of the ... edging closer, thanks to a wave of new technologies aiming to fix failing eye parts with human- ...

  3. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... videos on your website Promotional materials for eye health observances EyeSmart resources are also available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at ...

  4. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... valid prescription that includes the brand name, lens measurements, and expiration date. Purchase the colored contact lenses ... with human-made versions. U.S. News Highlights the Value of Ophthalmologists APR 20, 2018 By Dan T. ...

  5. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... sell contacts without a prescription are breaking the law, and may be fined $11,000 per violation. " ... Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms ...

  6. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... sell contacts without a prescription are breaking the law, and may be fined $11,000 per violation. " ... 13, 2017 Histoplasmosis Diagnosis Sep 01, 2017 How common is retinal detachment for people with high myopia? ...

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Ophthalmology/Strabismus Ocular Pathology/Oncology Oculoplastics/Orbit Refractive Management/Intervention Retina/Vitreous Uveitis Focus ... Eye Health A-Z Symptoms Glasses & Contacts Tips & ...

  8. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are considering buying approved by the ... Service For Advertisers For Media Ophthalmology Job Center © American ...

  9. Colored Contact Lens Dangers

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    Full Text Available ... be purchased over-the-counter or on the Internet," says Thomas Steinemann, MD, professor of ophthalmology at ... also available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About ...

  10. Ergonomics SA: Contact

    African Journals Online (AJOL)

    Principal Contact. Mrs June McDougall. Rhodes University. Department of Human Kinetics and Ergonomics. P.O. Box 94. Rhodes University. Grahamstown. 6140. Phone: +27 46 6038471. Email: j.mcdougall@ru.ac.za ...

  11. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are considering buying approved by ... 23, 2018 Solar Eclipse Inflicts Damage in the Shape of ...

  12. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... had not been properly fitted by an eye care professional, the lenses stuck to my eye like ... lenses do not require the same level of care or consideration as a standard contact lens because ...

  13. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... colored contact lenses to enhance their costumes. From blood-drenched vampire eyes to glow-in-the-dark ... properly fitted may scratch the eye or cause blood vessels to grow into the cornea. Even if ...

  14. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... to the journals may be interrupted during this time. We are working to resolve the issue quickly ... like a suction cup." Halloween is a popular time for people to use colored contact lenses to ...

  15. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... the United States. All contact lenses are medical devices that require a prescription and proper fitting by ... Care Apr 23, 2018 How long does it take the eye to go back to its original ...

  16. Tomato contact dermatitis

    DEFF Research Database (Denmark)

    Paulsen, Evy; Christensen, Lars P; Andersen, Klaus Ejner

    2012-01-01

    The tomato plant (Solanum lycopersicum) is an important crop worldwide. Whereas immediate-type reactions to tomato fruits are well known, contact dermatitis caused by tomatoes or tomato plants is rarely reported. The aims of this study were to present new data on contact sensitization to tomato...... plants and review the literature on contact dermatitis caused by both plants and fruits. An ether extract of tomato plants made as the original oleoresin plant extracts, was used in aimed patch testing, and between 2005 and 2011. 8 of 93 patients (9%) tested positive to the oleoresin extracts....... This prevalence is in accordance with the older literature that reports tomato plants as occasional sensitizers. The same applies to tomato fruits, which, in addition, may cause protein contact dermatitis. The allergens of the plant are unknown, but both heat-stable and heat-labile constituents seem...

  17. Fragrance allergic contact dermatitis.

    Science.gov (United States)

    Cheng, Judy; Zug, Kathryn A

    2014-01-01

    Fragrances are a common cause of allergic contact dermatitis in Europe and in North America. They can affect individuals at any age and elicit a spectrum of reactions from contact urticaria to systemic contact dermatitis. Growing recognition of the widespread use of fragrances in modern society has fueled attempts to prevent sensitization through improved allergen identification, labeling, and consumer education. This review provides an overview and update on fragrance allergy. Part 1 discusses the epidemiology and evaluation of suspected fragrance allergy. Part 2 reviews screening methods, emerging fragrance allergens, and management of patients with fragrance contact allergy. This review concludes by examining recent legislation on fragrances and suggesting potential additions to screening series to help prevent and detect fragrance allergy.

  18. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms of Service For Advertisers For Media Ophthalmology ...

  19. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... be purchased over-the-counter or on the Internet," says Thomas Steinemann, MD, professor of ophthalmology at ... about the members of the eye-care team . Consumer warning about the improper use of colored contact ...

  20. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Peligros asociados con los lentes de contacto de color Sep. 26, 2013 It started as an impulsive ... Halloween is a popular time for people to use colored contact lenses to enhance their costumes. From ...

  1. Colored Contact Lens Dangers

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    Full Text Available ... The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms of ...

  2. Colored Contact Lens Dangers

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    Full Text Available ... not require the same level of care or consideration as a standard contact lens because they can ... Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms ...

  3. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... be purchased over-the-counter or on the Internet," says Thomas Steinemann, MD, professor of ophthalmology at ... ask for a prescription. There is no such thing as a "one size fits all" contact lens. ...

  4. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... also available in Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical ...

  5. Colored Contact Lens Dangers

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    Full Text Available ... Ophthalmology/Strabismus Ocular Pathology/Oncology Oculoplastics/Orbit Refractive Management/Intervention Retina/Vitreous Uveitis Focus ... Halloween Hazard: The Hidden Dangers of Buying Decorative Contact Lenses Without ...

  6. Lettuce contact allergy.

    Science.gov (United States)

    Paulsen, Evy; Andersen, Klaus E

    2016-02-01

    Lettuce (Lactuca sativa L.) and its varieties are important vegetable crops worldwide. They are also well-known, rarely reported, causes of contact allergy. As lettuce allergens and extracts are not commercially available, the allergy may be underdiagnosed. The aims of this article are to present new data on lettuce contact allergy and review the literature. Lettuce is weakly allergenic, and occupational cases are mainly reported. Using aimed patch testing in Compositae-allergic patients, two recent Danish studies showed prevalence rates of positive lettuce reactions of 11% and 22%. The majority of cases are non-occupational, and may partly be caused by cross-reactivity. The sesquiterpene lactone mix seems to be a poor screening agent for lettuce contact allergy, as the prevalence of positive reactions is significantly higher in non-occupationally sensitized patients. Because of the easy degradability of lettuce allergens, it is recommended to patch test with freshly cut lettuce stem and supplement this with Compositae mix. As contact urticaria and protein contact dermatitis may present as dermatitis, it is important to perform prick-to-prick tests, and possibly scratch patch tests as well. Any person who is occupationally exposed to lettuce for longer periods, especially atopics, amateur gardeners, and persons keeping lettuce-eating pets, is potentially at risk of developing lettuce contact allergy. © 2015 John Wiley & Sons A/S. Published by John Wiley & Sons Ltd.

  7. Patients with multiple contact allergies

    DEFF Research Database (Denmark)

    Carlsen, Berit Christina; Andersen, Klaus Ejner; Menné, Torkil

    2008-01-01

    Patients with multiple contact allergies, also referred to as polysensitized, are more frequent than predicted from prevalence of single sensitivities. The understanding of why some people develop multiple contact allergies, and characterization of patients with multiple contact allergies...... of developing multiple contact allergies. Evidence of allergen clusters among polysensitized individuals is also reviewed. The literature supports the idea that patients with multiple contact allergies constitute a special entity within the field of contact allergy. There is no generally accepted definition...... of patients with multiple contact allergies. We suggest that contact allergy to 3 or more allergens are defined as multiple contact allergies....

  8. DNA damage caused by UV- and near UV-irradiation

    International Nuclear Information System (INIS)

    Ohnishi, Takeo

    1986-01-01

    Much work with mutants deficient in DNA repair has been performed concerning UV-induced DNA damage under the condition where there is no artificial stimulation. In an attempt to infer the effects of solar wavelengths, the outcome of the work is discussed in terms of cellular radiation sensitivity, unscheduled DNA synthesis, and mutation induction, leading to the conclusion that some DNA damage occurs even by irradiation of the shorter wavelength light (270 - 315 nm) and is repaired by excision repair. It has been thought to date that pyrimidine dimer (PD) plays the most important role in UV-induced DNA damage, followed by (6 - 4) photoproducts. As for DNA damage induced by near UV irradiation, the yield of DNA single-strand breaks and of DNA-protein crosslinking, other than PD, is considered. The DNA-protein crosslinking has proved to be induced by irradiation at any wavelength of UV ranging from 260 to 425 nm. Near UV irradiation causes the inhibition of cell proliferation to take place. (Namekawa, K.)

  9. Micropollutants removal by full-scale UV-C/sulfate radical based Advanced Oxidation Processes.

    Science.gov (United States)

    Rodríguez-Chueca, J; Laski, E; García-Cañibano, C; Martín de Vidales, M J; Encinas, Á; Kuch, B; Marugán, J

    2018-07-15

    The high chemical stability and the low biodegradability of a vast number of micropollutants (MPs) impede their correct treatment in urban wastewater treatment plants. In most cases, the chemical oxidation is the only way to abate them. Advanced Oxidation Processes (AOPs) have been experimentally proved as efficient in the removal of different micropollutants at lab-scale. However, there is not enough information about their application at full-scale. This manuscript reports the application of three different AOPs based on the addition of homogeneous oxidants [hydrogen peroxide, peroxymonosulfate (PMS) and persulfate anions (PS)], in the UV-C tertiary treatment of Estiviel wastewater treatment plant (Toledo, Spain) previously designed and installed in the facility for disinfection. AOPs based on the photolytic decomposition of oxidants have been demonstrated as more efficient than UV-C radiation alone on the removal of 25 different MPs using low dosages (0.05-0.5 mM) and very low UV-C contact time (4-18 s). Photolysis of PMS and H 2 O 2 reached similar average MPs removal in all the range of oxidant dosages, obtaining the highest efficiency with 0.5 mM and 18 s of contact time (48 and 55% respectively). Nevertheless, PMS/UV-C reached slightly higher removal than H 2 O 2 /UV-C at low dosages. So, these treatments are selective to degrade the target compounds, obtaining different removal efficiencies for each compound regarding the oxidizing agent, dosages and UV-C contact time. In all the cases, H 2 O 2 /UV-C is more efficient than PMS/UV-C, comparing the ratio cost:efficiency (€/m 3 ·order). Even H 2 O 2 /UV-C treatments are more efficient than UV-C alone. Thus, the addition of 0.5 mM of H 2 O 2 compensates the increased of UV-C contact time and therefore the increase of electrical consumption, that it should be need to increase the removal of MPs by UV-C treatments alone. Copyright © 2018 Elsevier B.V. All rights reserved.

  10. Self-assembled growth and structural analysis of inclined GaN nanorods on nanoimprinted m-sapphire using catalyst-free metal-organic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Kyuseung; Chae, Sooryong; Jang, Jongjin; Min, Daehong; Kim, Jaehwan; Nam, Okhyun, E-mail: ohnam@kpu.ac.kr [Convergence Center for Advanced Nano Semiconductor (CANS), Department of Nano-Optical Engineering, Korea Polytechnic University, Siheung, 15073 (Korea, Republic of)

    2016-04-15

    In this study, self-assembled inclined (1-10-3)-oriented GaN nanorods (NRs) were grown on nanoimprinted (10-10) m-sapphire substrates using catalyst-free metal-organic chemical vapor deposition. According to X-ray phi-scans, the inclined GaN NRs were tilted at an angle of ∼57.5° to the [10-10]{sub sapp} direction. Specifically, the GaN NRs grew in a single inclined direction to the [11-20]{sub sapp}. Uni-directionally inclined NRs were formed through the one-sided (10-11)-faceted growth of the interfacial a-GaN plane layer. It was confirmed that a thin layer of a-GaN was formed on r-facet nanogrooves of the m-sapphire substrate by nitridation. The interfacial a-GaN nucleation affected both the inclined angle and the growth direction of the inclined GaN NRs. Using X-ray diffraction and selective area electron diffraction, the epitaxial relationship between the inclined (1-10-3) GaN NRs and interfacial a-GaN layer on m-sapphire substrates was systematically investigated. Moreover, the inclined GaN NRs were observed to be mostly free of stacking fault-related defects using high-resolution transmission electron microscopy.

  11. Low-Cost and Rapid Fabrication of Metallic Nanostructures for Sensitive Biosensors Using Hot-Embossing and Dielectric-Heating Nanoimprint Methods

    Directory of Open Access Journals (Sweden)

    Kuang-Li Lee

    2017-07-01

    Full Text Available We propose two approaches—hot-embossing and dielectric-heating nanoimprinting methods—for low-cost and rapid fabrication of periodic nanostructures. Each nanofabrication process for the imprinted plastic nanostructures is completed within several seconds without the use of release agents and epoxy. Low-cost, large-area, and highly sensitive aluminum nanostructures on A4 size plastic films are fabricated by evaporating aluminum film on hot-embossing nanostructures. The narrowest bandwidth of the Fano resonance is only 2.7 nm in the visible light region. The periodic aluminum nanostructure achieves a figure of merit of 150, and an intensity sensitivity of 29,345%/RIU (refractive index unit. The rapid fabrication is also achieved by using radio-frequency (RF sensitive plastic films and a commercial RF welding machine. The dielectric-heating, using RF power, takes advantage of the rapid heating/cooling process and lower electric power consumption. The fabricated capped aluminum nanoslit array has a 5 nm Fano linewidth and 490.46 nm/RIU wavelength sensitivity. The biosensing capabilities of the metallic nanostructures are further verified by measuring antigen–antibody interactions using bovine serum albumin (BSA and anti-BSA. These rapid and high-throughput fabrication methods can benefit low-cost, highly sensitive biosensors and other sensing applications.

  12. Fabrication of high-brightness GaN-based light-emitting diodes via thermal nanoimprinting of ZnO-nanoparticle-dispersed resin

    International Nuclear Information System (INIS)

    Byeon, Kyeong-Jae; Cho, Joong-Yeon; Jo, Han-Byeol; Lee, Heon

    2015-01-01

    Highlights: • A various high-refractive-index ZnO patterns were formed on LED using imprinting. • Mechanism of light extraction enhancement was demonstrated by simulation and EL. • Light output power of patterned LED was improved up 19.6% by light waveguide effect. - Abstract: We fabricated high-brightness GaN-based light-emitting diodes (LEDs) with highly refractive patterned structures by using a thermal nanoimprint lithography (NIL). A highly refractive ZnO-nanoparticle-dispersed resin (ZNDR) was used in NIL, and a submicron hole, a submicron high-aspect-ratio pillar, and microconvex arrays were fabricated on the indium tin oxide (ITO) top electrode of GaN-based LED devices. We analyzed the light extraction mechanism for each of the three types of patterns by using a finite element method simulation, and found that the high-aspect-ratio pillar had a great ability to improve light extraction owing to its waveguide effect and prominent scattering effect. As a result, the light output power, which was measured in an integrating sphere, of the LED device was enhanced by up to 19.6% when the high-aspect-ratio pillar array was formed on the top ITO electrode of the device. Further, the electrical properties of none of the patterned LED devices fabricated using ZNDR degraded in comparison to those of bare LED devices

  13. Two-components UV-therapy

    International Nuclear Information System (INIS)

    Pullmann, H.; Steigleder, G.K.

    1980-01-01

    20 patients with generalized psoriasis were treated with an apparatus containing UV-A- and UV-B-fluorescence tubes to be switched separately. The therapy was started with an UV-A-dose of 12 J/cm 2 daily. After the first week of treatment UV-B in increasing doses was applicated additionally. Clearance was achieved in 80 percent. (orig.) [de

  14. Replication of butterfly wing and natural lotus leaf structures by nanoimprint on silica sol-gel films

    International Nuclear Information System (INIS)

    Saison, Tamar; Peroz, Christophe; Chauveau, Vanessa; Sondergard, Elin; Arribart, Herve; Berthier, Serge

    2008-01-01

    An original and low cost method for the fabrication of patterned surfaces bioinspired from butterfly wings and lotus leaves is presented. Silica-based sol-gel films are thermally imprinted from elastomeric molds to produce stable structures with superhydrophobicity values as high as 160 deg. water contact angle. The biomimetic surfaces are demonstrated to be tuned from superhydrophobic to superhydrophilic by annealing between 200 deg. C and 500 deg. C

  15. Replication of butterfly wing and natural lotus leaf structures by nanoimprint on silica sol-gel films

    Energy Technology Data Exchange (ETDEWEB)

    Saison, Tamar; Peroz, Christophe; Chauveau, Vanessa; Sondergard, Elin; Arribart, Herve [Unite mixte CNRS/Saint Gobain Saint Gobain Recherche, BP135, 93303 Aubervilliers (France); Berthier, Serge [Institut des Nanosciences de Paris, UMR 7588, CNRS, Universite Pierre et Marie Curie-Paris 6, 140 rue Lourmel, 75015 Paris (France)], E-mail: cperoz@lbl.gov

    2008-12-01

    An original and low cost method for the fabrication of patterned surfaces bioinspired from butterfly wings and lotus leaves is presented. Silica-based sol-gel films are thermally imprinted from elastomeric molds to produce stable structures with superhydrophobicity values as high as 160 deg. water contact angle. The biomimetic surfaces are demonstrated to be tuned from superhydrophobic to superhydrophilic by annealing between 200 deg. C and 500 deg. C.

  16. Nanoimprint lithography in the cyclic olefin copolymer, Topas, a highly ultraviolet-transparent and chemically resistant thermoplast

    DEFF Research Database (Denmark)

    Nielsen, T.; Nilsson, D.; Bundgaard, F.

    2004-01-01

    -on-a-chipapplications. In particular, Topas® is suitable for micro systems made for optical bio-detection since waveguides for UV-light can be made directly in Topas®. In this article full process sequences for spin coating Topas® onto 4 in. silicon wafers, NIL silicon stamp fabrication with micro and nanometer sized features...... by metal deposition and lift-off ontop of a Topas® film patterned by NIL is demonstrated. This exploits the chemical resistance ofTopas® to sodium hydroxide and acetone. The demonstrated UVL and lift-off on top of an imprinted Topas® film opens new possibilities for post-NIL processing....

  17. Excimer UV curing in printing

    International Nuclear Information System (INIS)

    Mehnert, R.

    1999-01-01

    It is the aim of this study to investigate the potential of 308 run excimer UV curing in web and sheet fed offset printing and to discuss its present status. Using real-time FTIR-ATR and stationary or pulsed monochromatic (313 nm) irradiation chemical and physical factors affecting the curing speed of printing inks such as nature and concentration of photo-initiators, reactivity of the ink binding system, ink thickness and pigmentation, irradiance in the curing plane, oxygen concentration and nitrogen inerting, multiple pulse exposure, the photochemical dark reaction and temperature dependence were studied. The results were used to select optimum conditions for excimer UV curing in respect to ink reactivity, nitrogen inerting and UV exposure and to build an excimer UV curing unit consisting of two 50 W/cm 308 run excimer lamps, power supply, cooling and inerting unit. The excimer UV curing devices were tested under realistic conditions on a web offset press zirkon supra forte and a sheet fed press Heidelberg GTO 52. Maximum curing speeds of 300 m/min in web offset and 8000 sheets per hour in sheet fed offset were obtained

  18. UV-indeks og dets betydning

    DEFF Research Database (Denmark)

    Wulf, Hans Christian; Eriksen, Paul

    2010-01-01

    The published UV index refers to the expected UV intensity at mid day, when the solar elevation is at its maximum. In Scandinavia, the maximum UV index is seven around midsummer. When the UV index is three, the erythema-weighted dose will be three Standard Erythema Dose (SED) in the hour with max...... a sunburn already when the UV index is higher than two....

  19. Rough Surface Contact

    Directory of Open Access Journals (Sweden)

    T Nguyen

    2017-06-01

    Full Text Available This paper studies the contact of general rough curved surfaces having nearly identical geometries, assuming the contact at each differential area obeys the model proposed by Greenwood and Williamson. In order to account for the most general gross geometry, principles of differential geometry of surface are applied. This method while requires more rigorous mathematical manipulations, the fact that it preserves the original surface geometries thus makes the modeling procedure much more intuitive. For subsequent use, differential geometry of axis-symmetric surface is considered instead of general surface (although this “general case” can be done as well in Chapter 3.1. The final formulas for contact area, load, and frictional torque are derived in Chapter 3.2.

  20. Acrylate Systemic Contact Dermatitis.

    Science.gov (United States)

    Sauder, Maxwell B; Pratt, Melanie D

    2015-01-01

    Acrylates, the 2012 American Contact Dermatitis Society allergen of the year, are found in a range of products including the absorbent materials within feminine hygiene pads. When fully polymerized, acrylates are nonimmunogenic; however, if not completely cured, the monomers can be potent allergens.A 28-year-old woman is presented, who had her teeth varnished with Isodan (Septodont, Saint-Maur-des-Fossés, France) containing HEMA (2-hydroxyethyl methacrylate) with no initial reaction. Approximately 1 month later, the patient developed a genital dermatitis secondary to her feminine hygiene pads. The initial reaction resolved, but 5 months later, the patient developed a systemic contact dermatitis after receiving a second varnishing.The patient was dramatically patch test positive to many acrylates. This case demonstrates a reaction to likely unpolymerized acrylates within a feminine hygiene pad, as well as broad cross-reactivity or cosensitivity to acrylates, and possibly a systemic contact dermatitis with systemic re-exposure to unpolymerized acrylates.

  1. Shoe allergic contact dermatitis.

    Science.gov (United States)

    Matthys, Erin; Zahir, Amir; Ehrlich, Alison

    2014-01-01

    Foot dermatitis is a widespread condition, affecting men and women of all ages. Because of the location, this condition may present as a debilitating problem to those who have it. Allergic contact dermatitis involving the feet is frequently due to shoes or socks. The allergens that cause shoe dermatitis can be found in any constituent of footwear, including rubber, adhesives, leather, dyes, metals, and medicaments. The goal of treatment is to identify and minimize contact with the offending allergen(s). The lack of product information released from shoe manufacturers and the continually changing trends in footwear present a challenge in treating this condition. The aim of this study is to review the current literature on allergic contact shoe dermatitis; clinical presentation, allergens, patch testing, and management will be discussed. PubMed and MEDLINE databases were used for the search, with a focus on literature updates from the last 15 years.

  2. Effects of UV-B radiation on wax biosynthesis

    International Nuclear Information System (INIS)

    Barnes, J.; Paul, N.; Percy, K.; Broadbent, P.; McLaughlin, C.; Mullineaux, P.; Creissen, G.; Wellburn, A.

    1994-01-01

    Two genotypes of tobacco (Nicotiana tabacum L.) were exposed in controlled environment chambers to three levels of biologically effective ultraviolet-B radiation (UV-B BE ; 280-320nm): 0, 4.54 (ambient) and 5.66 (∼ 25% enhancement) kJ m -2 d -1 . After 28 days, the quantity of wax deposited on leaf surfaces was determined gravimetrically; epicuticular wax chemical composition was determined by capillary gas chromatography with homologue assignments confirmed by gas chromatography-mass spectrometry. Leaf wettability was assessed by measuring the contact angle of water droplets placed on leaf surfaces. Tobacco wax consisted of three major hydrocarbon classes: Straight-chain alkanes (C 27 -C 33 ) which comprised ∼ 59% of the hydrocarbon fraction, containing a predominance of odd-chain alkanes with C 31 as the most abundant homologue; branched-chain alkanes (C 25 -C 32 ) which comprised ∼38% of the hydrocarbon fraction with anteiso 3-methyltriacontane (C 30 ) as the predominant homologue; and fatty acids (C 14 -C 18 ) which comprised ∼ 3% of the wax. Exposure to enhanced UV-B radiation reduced the quantity of wax on the adaxial surface of the transgenic mutant, and resulted in marked changes in the chemical composition of the wax on the exposed leaf surface. Enhanced UV-B decreased the quantity of straight-chain alkanes, increased the quantity of branched-chain alkanes and fatty acids, and resulted in shifts toward shorter straight-chain lengths. Furthermore, UV-B-induced changes in wax composition were associated with increased wettability of tobacco leaf surfaces. Overall, the data are consistent with the view that UV-B radiation has a direct and fundamental effect on wax biosynthesis. Relationships between the physico-chemical nature of the leaf surface and sensitivity to UV-B radiation are discussed. (orig.)

  3. ALLERGIC CONTACT DERMATITIS

    Directory of Open Access Journals (Sweden)

    Trisna Yuliharti Tersinanda

    2013-07-01

    Full Text Available Normal 0 false false false EN-US X-NONE X-NONE Allergic contact dermatitis is an immunologic reaction that tends to involve the surrounding skin and may even spread beyond affected sites. This skin disease is one of the more frequent, and costly dermatologic problems. Recent data from United Kingdom and United States suggest that the percentage of occupational contact dermatitis due to allergy may be much higher, thus raising the economic impact of occupational allergic contact dermatitis. There is not enough data about the epidemiology of allergic contact dermatitis in Indonesia, however based on research that include beautician in Denpasar, about 27,6 percent had side effect of cosmetics, which is 25,4 percent of it manifested as allergic contact dermatitis. Diagnosis of allergic contact dermatitis is based on anamnesis, physical examination, patch test, and this disease should be distinguished from other eczematous skin disease. The management is prevention of allergen exposure, symptomatic treatment, and physicochemical barrier /* Style Definitions */ table.MsoNormalTable {mso-style-name:"Table Normal"; mso-tstyle-rowband-size:0; mso-tstyle-colband-size:0; mso-style-noshow:yes; mso-style-priority:99; mso-style-qformat:yes; mso-style-parent:""; mso-padding-alt:0in 5.4pt 0in 5.4pt; mso-para-margin-top:0in; mso-para-margin-right:0in; mso-para-margin-bottom:10.0pt; mso-para-margin-left:0in; line-height:115%; mso-pagination:widow-orphan; font-size:11.0pt; font-family:"Calibri","sans-serif"; mso-ascii-font-family:Calibri; mso-ascii-theme-font:minor-latin; mso-fareast-font-family:"Times New Roman"; mso-fareast-theme-font:minor-fareast; mso-hansi-font-family:Calibri; mso-hansi-theme-font:minor-latin; mso-bidi-font-family:"Times New Roman"; mso-bidi-theme-font:minor-bidi;}

  4. Supersensitive, Fast-Response Nanowire Sensors by Using Schottky Contacts

    KAUST Repository

    Hu, Youfan

    2010-05-31

    A Schottky barrier can be formed at the interface between a metal electrode and a semiconductor. The current passing through the metal-semiconductor contact is mainly controlled by the barrier height and barrier width. In conventional nanodevices, Schottky contacts are usually avoided in order to enhance the contribution made by the nanowires or nanotubes to the detected signal. We present a key idea of using the Schottky contact to achieve supersensitive and fast response nanowire-based nanosensors. We have illustrated this idea on several platforms: UV sensors, biosensors, and gas sensors. The gigantic enhancement in sensitivity of up to 5 orders of magnitude shows that an effective usage of the Schottky contact can be very beneficial to the sensitivity of nanosensors. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

    Science.gov (United States)

    Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jaewon; Huang, Caili; Jeong, Gajin; Coughlin, E Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y; Kuo, David S; Xiao, Shuaigang; Russell, Thomas P

    2015-08-05

    Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  6. Ecotoxicological effect characterisation of widely used organic UV filters

    International Nuclear Information System (INIS)

    Kaiser, D.; Sieratowicz, A.; Zielke, H.; Oetken, M.; Hollert, H.; Oehlmann, J.

    2012-01-01

    Chemical UV filters are used in sun protection and personal care products in order to protect consumers from skin cancer induced by ultraviolet (UV) radiation. The present study aims to evaluate the effects of three common UV filters butyl-methoxydibenzoylmethane (B-MDM) ethylhexyl-methoxycinnamate (EHMC) and octocrylene (OCR) on aquatic organism, focussing particularly on infaunal and epibentic invertebrates (Chironomus riparius, Lumbriculus variegatus, Melanoides tuberculata and Potamopyrgus antipodarum). Due to their life habits, these organism are especially affected by lipophilic substances. Additionally, two direct sediment contact assays utilising zebra fish (Danio rerio) embryos and bacteria (Arthrobacter globiformis) were conducted. EHMC caused a toxic effect on reproduction in both snails with lowest observed effect concentrations (LOEC) of 0.4 mg/kg (Potamopyrgus antipodarum) and 10 mg/kg (Melanoides tuberculata). At high concentrations sublethal effects could be observed for D. rerio after exposure to EHMC (NOEC 100 mg/kg). B-MDM and OCR showed no effects on any of the tested organism. - Highlights: ► Ecotoxicological effects of common used UV filters on aquatic invertebrates. ► Butyl-methoxydibenzoylmethane, ethylhexyl-methoxycinnamate, and octocrylene used. ► Sediment based test systems. ► Ethylhexyl-methoxycinnamate caused a toxic effect on reproduction in both snails. ► Other substances showed no effects on any of the tested organism. - Ethylhexyl-methoxycinnamate caused a toxic effect on reproduction in both snails. Butyl-methoxydibenzoylmethane and octocrylene showed no effects on any of the tested organism.

  7. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Spanish . Follow The Academy Professionals: Education Guidelines News Multimedia Public & Patients: Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical Disclaimer Privacy Policy Terms of Service For Advertisers For Media Ophthalmology Job Center © American ...

  8. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Tips & Prevention News Ask an Ophthalmologist Patient Stories Español Eye Health / News Halloween Hazard: The Hidden Dangers ... Decorative Contact Lenses Without a Prescription Leer en Español: Peligros asociados con los lentes de contacto de ...

  9. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... prescription. There is no such thing as a "one size fits all" contact lens. Lenses that are not properly fitted may scratch the eye or cause blood vessels to grow into the cornea. Even if you have perfect vision, you need to get an eye exam and a prescription ...

  10. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... MD, professor of ophthalmology at Case Western Reserve University in Cleveland. "This is far from the truth." ... use of colored contact lenses , from the U.S. Food and Drug Administration (FDA). Are the colored lenses you are considering buying approved by the ... Service For Advertisers For Media Ophthalmology Job Center © American ...

  11. Fermilab | Contact Fermilab

    Science.gov (United States)

    Education Safety Sustainability and Environment Contact Related Links DOE FRA UChicago URA Newsroom -840-3000 Fax: 630-840-4343 Shipping address Fermilab Receiving Wilson Street and Kirk Road Batavia IL 60510-5011 Phone: 630-840-3000 Visiting address Fermilab entrance Kirk Road and Pine Street Batavia IL

  12. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Español Eye Health / News Halloween Hazard: The Hidden Dangers of Buying Decorative Contact Lenses Without a Prescription ... be purchased over-the-counter or on the Internet," says Thomas Steinemann, MD, professor of ophthalmology at ...

  13. Lettuce contact allergy

    DEFF Research Database (Denmark)

    Paulsen, Evy; Andersen, Klaus E

    2016-01-01

    Lettuce (Lactuca sativa L.) and its varieties are important vegetable crops worldwide. They are also well-known, rarely reported, causes of contact allergy. As lettuce allergens and extracts are not commercially available, the allergy may be underdiagnosed. The aims of this article are to present...... person who is occupationally exposed to lettuce for longer periods, especially atopics, amateur gardeners, and persons keeping lettuce-eating pets, is potentially at risk of developing lettuce contact allergy.......Lettuce (Lactuca sativa L.) and its varieties are important vegetable crops worldwide. They are also well-known, rarely reported, causes of contact allergy. As lettuce allergens and extracts are not commercially available, the allergy may be underdiagnosed. The aims of this article are to present...... new data on lettuce contact allergy and review the literature. Lettuce is weakly allergenic, and occupational cases are mainly reported. Using aimed patch testing in Compositae-allergic patients, two recent Danish studies showed prevalence rates of positive lettuce reactions of 11% and 22...

  14. Contact allergy to spices

    NARCIS (Netherlands)

    W. Van den Akker Th. (W.); I.D. Roesyanto-Mahadi (I.); A.W. van Toorenenbergen (Albert); Th. van Joost (Theo)

    1990-01-01

    textabstractA group of 103 patients suspected of contact allergy was tested with the European standard series, wood tars and spices; paprika, cinnamon, laurel, celery seed, nutmeg, curry, black pepper, cloves, while pepper, coriander, cacao and garlic. 32 patients (Group I) were selected on the

  15. Fermilab Education Office - Contacts

    Science.gov (United States)

    Search The Office of Education and Public Outreach: Contacts All telephone numbers require area code Presentations for Presenters 840-3094 Office of Education and Public Outreach Spencer Pasero spasero@fnal.gov Education Office 840-3076 Fermilab Friends for Science Education General Questions Susan Dahl sdahl@fnal.gov

  16. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... A medical degree and many more years of training, for starters. A recent article from U.S. News and World Report explains what ophthalmologists are and how they can help you look after ... Contact Us About the Academy Jobs at the Academy Financial Relationships with Industry Medical ...

  17. Mathematics Connection: Contact

    African Journals Online (AJOL)

    Principal Contact. Dr. Kofi Mereku Executive Editor Department of Mathematics Education, UCE Mathematical Association of Ghana, C/o Department of Mathematics Education University College of Education of Winneba P. O. Box 25, Winneba, Ghana Phone: +233244961318. Email: dkmereku@uew.edu.gh ...

  18. Contact activation: a revision.

    Science.gov (United States)

    Schmaier, A H

    1997-07-01

    In conclusion, a revised view of the contact system has been presented. This system has little to do with the initiation of hemostasis. Like lupus anticoagulants, deficiencies of contact proteins give prolonged APTTs but may be risk factors for thrombosis. BK from kininogens is a potent modulator of vascular biology inducing vasodilation, tissue plasminogen activator release, and prostacyclin liberation. Kininogens, themselves, are selective inhibitors of alpha-thrombin-induced platelet activation preventing alpha-thrombin from cleaving the cloned thrombin receptor after arginine41. Kininogens' alpha-thrombin inhibitory activity exists in intact kininogens, BK, and all of BK's breakdown products. HK also is the pivotal protein for contact protein assembly on endothelium. It is the receptor for prekallikrein which when bound to HK becomes activated to kallikrein by an endothelial cell enzyme system independent of activated forms of plasma factor XII. Prekallikrein activation on endothelial cells results in kinetically favorable single chain urokinase and plasminogen activation. Thus the "physiologic, negatively charged surface" for contact system activation is really the assembly of these proteins on cell membranes and activation by membrane-associated enzymes.

  19. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... wear any kind of contact lens. In Butler's case, the lenses caused an infection and left her with a corneal ... A recent article from U.S. News and World Report explains what ophthalmologists are and how they can ...

  20. Language Contact and Bilingualism

    NARCIS (Netherlands)

    Appel, René; Muysken, Pieter

    2006-01-01

    What happens - sociologically, linguistically, educationally, politically - when more than one language is in regular use in a community? How do speakers handle these languages simultaneously, and what influence does this language contact have on the languages involved? Although most people in the

  1. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... Health / News Halloween Hazard: The Hidden Dangers of Buying Decorative Contact Lenses Without a Prescription Leer en Español: Peligros asociados con los lentes de contacto de color Sep. 26, 2013 It started as an impulsive buy from a souvenir shop, but 10 hours ...

  2. Pizza makers' contact dermatitis.

    Science.gov (United States)

    Lembo, Serena; Lembo, Claudio; Patruno, Cataldo; Balato, Anna; Balato, Nicola; Ayala, Fabio

    2014-01-01

    Contact eczema to foods, spices, and food additives can occur in occupational and nonoccupational settings in those who grow, handle, prepare, or cook food. Pizza is one of the most eaten foods in every continent, and pizza making is a common work in many countries. We aimed to evaluate the occurrence and the causes of contact dermatitis in pizza makers in Naples. We performed an observational study in 45 pizza makers: all the enrolled subjects had to answer a questionnaire designed to detect personal history of respiratory or cutaneous allergy, atopy; work characteristics and timing were also investigated. Every subject attended the dermatology clinic for a complete skin examination, and when needed, patients were patch tested using the Italian baseline series of haptens integrated with an arbitrary pizza makers series. Our results reported that 13.3% of the enrolled pizza makers (6/45) presented hand eczema, and that 8.9% (4/45) were affected by occupational allergic contact dermatitis. Diallyl disulfide and ammonium persulfate were the responsible substances. Performing patch tests in pizza makers and food handlers affected by hand contact dermatitis is useful. We propose a specific series of haptens for this wide working category.

  3. Contact: Releasing the news

    Science.gov (United States)

    Pinotti, Roberto

    The problem of mass behavior after man's future contacts with other intelligences in the universe is not only a challenge for social scientists and political leaders all over the world, but also a cultural time bomb as well. In fact, since the impact of CETI (Contact with Extraterrestrial Intelligence) on human civilization, with its different cultures, might cause a serious socio-anthropological shock, a common and predetermined worldwide strategy is necessary in releasing the news after the contact, in order to keep possible manifestations of fear, panic and hysteria under control. An analysis of past studies in this field and of parallel historical situations as analogs suggests a definite "authority crisis" in the public as a direct consequence of an unexpected release of the news, involving a devastating "chain reaction" process (from both the psychological and sociological viewpoints) of anomie and maybe the collapse of today's society. The only way to prevent all this is to prepare the world's public opinion concerning contact before releasing the news, and to develop a long-term strategy through the combined efforts of scientists, political leaders, intelligence agencies and the mass media, in order to create the cultural conditions in which a confrontation with ETI won't affect mankind in a traumatic way. Definite roles and tasks in this multi-level model are suggested.

  4. Rigid Bodies in Contact

    DEFF Research Database (Denmark)

    Niebe, Sarah Maria

    . A contact point determination method, based on boolean surface maps, is developed to handle collisions between tetrahedral meshes. The novel nonsmooth nonlinear conjugate gradient (NNCG) method is presented. The NNCG method is comparable in terms of accuracy to the state-of-the-art method, projected Gauss...

  5. Colored Contact Lens Dangers

    Medline Plus

    Full Text Available ... can be purchased over-the-counter or on the Internet," says Thomas Steinemann, MD, professor of ophthalmology at ... ask for a prescription. There is no such thing as a "one size fits all" contact lens. Lenses that are not properly fitted may scratch the eye or cause blood vessels to grow into ...

  6. Contact allergy to cosmetics

    DEFF Research Database (Denmark)

    Held, E; Johansen, J D; Agner, T

    1999-01-01

    In a 2-year period, 1527 patients with contact dermatitis were investigated in the patch-test clinic. In 531 patients, allergy to cosmetics was suspected from the history and they were tested with their own cosmetic products. 40 (7.5%) (of the 531 patients) had 1 or more positive reactions, 82 (15...

  7. Ghana Mining Journal: Contact

    African Journals Online (AJOL)

    Principal Contact. Professor Daniel Mireku-Gyimah Editor-in-Chief University of Mines & Technology Ghana Mining Journal University of Mines & Technology P. O. BOX 237 Tarkwa Ghana Phone: +233 362 20280/20324. Fax: +233 362 20306. Email: dm.gyimah@umat.edu.gh ...

  8. Fabrication of zero contact angle ultra-super hydrophilic surfaces.

    Science.gov (United States)

    Jothi Prakash, C G; Clement Raj, C; Prasanth, R

    2017-06-15

    Zero contact angle surfaces have been created with the combined effect of nanostructure and UV illumination. The contact angle of titanium surface has been optimized to 3.25°±1°. with nanotubular structures through electrochemical surface modification. The porosity and surface energy of tubular TiO 2 layer play critical role over the surface wettability and the hydrophilicity of the surface. The surface free energy has been enhanced from 23.72mJ/m 2 (bare titanium surface) to 87.11mJ/m 2 (nanotubular surface). Similar surface with TiO 2 nanoparticles coating shows superhydrophilicity with contact angle up to 5.63°±0.95°. This implies liquid imbibition and surface curvature play a crucial role in surface hydrophilicity. The contact angle has been further reduced to 0°±0.86° by illuminating the surface with UV radiation. Results shows that by tuning the nanotube morphology, highly porous surfaces can be fabricated to reduce contact angle and enhance wettability. This study provides an insight into the inter-relationship between surface structural factors and ultra-superhydrophilic surfaces which can help to optimize thermal hydraulic and self cleaning surfaces. Copyright © 2017. Published by Elsevier Inc.

  9. Molecular dynamics study of contact mechanics: contact area and interfacial separation from small to full contact

    OpenAIRE

    Yang, C.; Persson, B. N. J.

    2007-01-01

    We report a molecular dynamics study of the contact between a rigid solid with a randomly rough surface and an elastic block with a flat surface. We study the contact area and the interfacial separation from small contact (low load) to full contact (high load). For small load the contact area varies linearly with the load and the interfacial separation depends logarithmically on the load. For high load the contact area approaches to the nominal contact area (i.e., complete contact), and the i...

  10. Focusing on Contact Lens Safety

    Science.gov (United States)

    ... their practices. Decorative contacts (also called “costume,” colored,” “fashion,” or “plano” contacts). The FDA has often warned ... Lenses Decorative Contact Lenses Hydrogen Peroxide Solution Related Consumer Updates 'Colored' and Decorative Contact Lenses: A Prescription ...

  11. Near UV Aerosol Group Report

    Science.gov (United States)

    Torres, Omar

    2013-01-01

    2012-13 Report of research on aerosol and cloud remote sensing using UV observations. The document was presented at the 2013 AEROCENTER Annual Meeting held at the GSFC Visitors Center, May 31, 2013. The Organizers of the meeting are posting the talks to the public Aerocentr website, after the meeting.

  12. Poling of UV-written Waveguides

    DEFF Research Database (Denmark)

    Arentoft, Jesper; Kristensen, Martin; Hübner, Jörg

    1999-01-01

    We report poling of UV-written silica waveguides. Thermal poling induces an electro-optic coefficient of 0.05 pm/V. We also demonstrate simultaneous UV-writing and UV-poling. No measurable decay in the induced electro-optic effect was detected after nine months......We report poling of UV-written silica waveguides. Thermal poling induces an electro-optic coefficient of 0.05 pm/V. We also demonstrate simultaneous UV-writing and UV-poling. No measurable decay in the induced electro-optic effect was detected after nine months...

  13. Electrical contacts principles and applications

    CERN Document Server

    Slade, Paul G

    2013-01-01

    Covering the theory, application, and testing of contact materials, Electrical Contacts: Principles and Applications, Second Edition introduces a thorough discussion on making electric contact and contact interface conduction; presents a general outline of, and measurement techniques for, important corrosion mechanisms; considers the results of contact wear when plug-in connections are made and broken; investigates the effect of thin noble metal plating on electronic connections; and relates crucial considerations for making high- and low-power contact joints. It examines contact use in switch

  14. [News on occupational contact dermatitis].

    Science.gov (United States)

    Crépy, Marie-Noëlle; Bensefa-Colas, Lynda

    2014-03-01

    Contact dermatitis--irritant contact dermatitis, allergic contact dermatitis and protein contact dermatitis--are the most common occupational skin diseases, most often localized to the hands. Contact urticaria is rarer The main occupational irritants are wet work, detergents and disinfectants, cutting oils, and solvents. The main occupational allergens are rubber additives, metals (chromium, nickel, cobalt), plastics (epoxy resins, acrylic), biocides and plants. Diagnosis is based on clinical examination, medical history and allergy testing. For a number of irritating or sensitizing agents, irritant or allergic dermatitis can be notified as occupational diseases. The two main prevention measures are reducing skin contact with irritants and complete avoidance of skin contact with offending allergens.

  15. Periodic nanostructures imprinted on high-temperature stable sol–gel films by ultraviolet-based nanoimprint lithography for photovoltaic and photonic applications

    Energy Technology Data Exchange (ETDEWEB)

    Back, Franziska [Schott AG, Research and Technology Development, Hattenbergstraße 10, 55122 Mainz (Germany); Fraunhofer-Institut für Silicatforschung ISC, Neunerplatz 2, 97082 Würzburg (Germany); Bockmeyer, Matthias; Rudigier-Voigt, Eveline [Schott AG, Research and Technology Development, Hattenbergstraße 10, 55122 Mainz (Germany); Löbmann, Peer [Fraunhofer-Institut für Silicatforschung ISC, Neunerplatz 2, 97082 Würzburg (Germany)

    2014-07-01

    Nanostructured sol–gel films with high-temperature stability are used in the area of electronics, photonics or biomimetic materials as light-trapping architectures in solar cells, displays, waveguides or as superhydrophobic surfaces with a lotus effect. In this work, high-temperature stable 2-μm nanostructured surfaces were prepared by ultraviolet-based nanoimprint lithography using an alkoxysilane binder incorporating modified silica nanoparticles. Material densification during thermal curing and microstructural evolution which are destined for a high structural fidelity of nanostructured films were investigated in relation to precursor chemistry, particle morphology and particle content of the imprint resist. The mechanism for densification and shrinkage of the films was clarified and correlated with the structural fidelity to explain the influence of the geometrical design on the optical properties. A high internal coherence of the microstructure of the nanostructured films results in a critical film thickness of > 5 μm. The structured glassy layers with high inorganic content show thermal stability up to 800 °C and have a high structural fidelity > 90% with an axial shrinkage of 16% and a horizontal shrinkage of 1%. This material allows the realization of highly effective light-trapping architectures for polycrystalline silicon thin-film solar cells on glass but also for the preparation of 2D photonic crystals for telecommunication wavelengths. - Highlights: • Fundamental research • Hybrid sol–gel material with high-temperature stability and contour accuracy • Ensuring of cost-efficient and industrially feasible processing • Application in photonic and photovoltaic.

  16. HTSC-Josephson step contacts

    International Nuclear Information System (INIS)

    Herrmann, K.

    1994-03-01

    In this work the properties of josephson step contacts are investigated. After a short introduction into Josephson step contacts the structure, properties and the Josphson contacts of YBa 2 Cu 3 O 7-x high-T c superconductors is presented. The fabrication of HTSC step contacts and the microstructure is discussed. The electric properties of these contacts are measured together with the Josephson emission and the magnetic field dependence. The temperature dependence of the stationary transport properties is given. (WL)

  17. Host cell reactivation and UV-enhanced reactivation in synchronized mammalian cells

    International Nuclear Information System (INIS)

    Lytle, C.D.; Schmidt, B.J.

    1981-01-01

    Does host cell reactivation (HCR) or UV-enhanced reactivation (UVER) of UV-irradiated Herpes simplex virus (UV-HSV) vary during the host mammalian cell cycle. The answer could be useful for interpreting UVER and or the two-component nature of the UV-HSV survival curve. Procedures were developed for infection of mitotically-synchronized CV-l monkey kidney cells. All virus survival curves determined at different cell cycle stages had two components with similar D 0 's and intercepts of the second components. Thus, no single stage of the host cell cycle was responsible for the second component of the virus survival curve. When the cells were UV-irradiated immediately prior to infection, enhanced survival of UV-HSV occurred for cell irradiation and virus infection initiated during late G 1 early S phase or late S early G 2 phase but not during early G 1 phase. For infection delayed by 24 h after cell irradiation, UVER was found at all investigated times. These results indicate that: (1) HCR is similar at all stages of the host cell cycle: and (2) the ''induction'' of UVER is not as rapid for cell-irradiation in early G 1 phase. This latter observation may be one reason why normal, contact-inhibited cells do not express UVER as rapidly as faster growing, less contact-inhibited cells. (author)

  18. Contact dynamics math model

    Science.gov (United States)

    Glaese, John R.; Tobbe, Patrick A.

    1986-01-01

    The Space Station Mechanism Test Bed consists of a hydraulically driven, computer controlled six degree of freedom (DOF) motion system with which docking, berthing, and other mechanisms can be evaluated. Measured contact forces and moments are provided to the simulation host computer to enable representation of orbital contact dynamics. This report describes the development of a generalized math model which represents the relative motion between two rigid orbiting vehicles. The model allows motion in six DOF for each body, with no vehicle size limitation. The rotational and translational equations of motion are derived. The method used to transform the forces and moments from the sensor location to the vehicles' centers of mass is also explained. Two math models of docking mechanisms, a simple translational spring and the Remote Manipulator System end effector, are presented along with simulation results. The translational spring model is used in an attempt to verify the simulation with compensated hardware in the loop results.

  19. Contact allergy to lanolin

    DEFF Research Database (Denmark)

    Fransen, Marloes; Overgaard, Line E K; Johansen, Jeanne D

    2018-01-01

    BACKGROUND: Lanolin has been tested as lanolin alcohols (30% pet.) in baseline patch test series since 1969, and this has shown clinically relevant allergic contact dermatitis cases. OBJECTIVES: To investigate the temporal development of lanolin allergy (i.e. positive reaction to lanolin alcohols...... and/or Amerchol™ L-101), and the association between contact allergy to lanolin and patient characteristics from the MOAHLFA index. METHODS: A retrospective observational study of consecutively patch tested dermatitis patients (n = 9577) between 1 January 2004 and 31 December 2015 with lanolin...... alcohols 30% pet. and Amerchol™ L-101 50% pet. was performed. RESULTS: The prevalence of lanolin allergy increased from 0.45% in 2004 to 1.81% in 2015. In age-adjusted and sex-adjusted analyses, weak, significant associations were found between atopic dermatitis and lanolin and lanolin alcohols allergy...

  20. Photopatch and UV-irradiated patch testing in photosensitive dermatitis

    Directory of Open Access Journals (Sweden)

    Reena Rai

    2016-01-01

    Full Text Available Background: The photopatch test is used to detect photoallergic reactions to various antigens such as sunscreens and drugs. Photosensitive dermatitis can be caused due to antigens like parthenium, fragrances, rubbers and metals. The photopatch test does not contain these antigens. Therefore, the Indian Standard Series (ISS along with the Standard photopatch series from Chemotechnique Diagnostics, Sweden was used to detect light induced antigens. Aim: To detect light induced antigens in patients with photosensitive dermatitis. Methods: This study was done in a descriptive, observer blinded manner. Photopatch test and ISS were applied in duplicate on the patient's back by the standard method. After 24 hours, readings were recorded according to ICDRG criteria. One side was closed and other side irradiated with 14 J/cm2 of UVA and a second set of readings were recorded after 48 hrs. Result: The highest positivity was obtained with parthenium, with 18 out of 35 (51% patients showing a positive patch test reaction with both photoallergic contact dermatitis and photoaggravation. Four patients (11% showed positive patch test reaction suggestive of contact dermatitis to potassium dichromate and fragrance mix. Six patients had contact dermatitis to numerous antigens such as nickel, cobalt, chinoform and para-phenylenediamine. None of these patients showed photoaggravation on patch testing. Conclusion: Parthenium was found to cause photoallergy, contact dermatitis with photoaggravation and contact allergy. Hence, photopatch test and UV irradiated patch test can be an important tool to detect light induced antigens in patients with photosensitive dermatitis.

  1. Contact stress sensor

    Science.gov (United States)

    Kotovsky, Jack [Oakland, CA

    2012-02-07

    A contact stress sensor includes one or more MEMS fabricated sensor elements, where each sensor element of includes a thin non-recessed portion, a recessed portion and a pressure sensitive element adjacent to the recessed portion. An electric circuit is connected to the pressure sensitive element. The circuit includes a thermal compensator and a pressure signal circuit element configured to provide a signal upon movement of the pressure sensitive element.

  2. Occupational protein contact dermatitis.

    Science.gov (United States)

    Barbaud, Annick; Poreaux, Claire; Penven, Emmanuelle; Waton, Julie

    2015-01-01

    Occupational contact dermatitis is generally caused by haptens but can also be induced by proteins causing mainly immunological contact urticaria (ICU); chronic hand eczema in the context of protein contact dermatitis (PCD). In a monocentric retrospective study, from our database, only 31 (0.41%) of patients with contact dermatitis had positive skin tests with proteins: 22 had occupational PCD, 3 had non-occupational PCD, 5 occupational ICU and 1 cook had a neutrophilic fixed food eruption (NFFE) due to fish. From these results and analysis of literature, the characteristics of PCD can be summarized as follows. It is a chronic eczematous dermatitis, possibly exacerbated by work, suggestive if associated with inflammatory perionyxix and immediate erythema with pruritis, to be investigated when the patient resumes work after a period of interruption. Prick tests with the suspected protein-containing material are essential, as patch tests have negative results. In case of multisensitisation revealed by prick tests, it is advisable to analyse IgE against recombinant allergens. A history of atopy, found in 56 to 68% of the patients, has to be checked for. Most of the cases are observed among food-handlers but PCD can also be due to non-edible plants, latex, hydrolysed proteins or animal proteins. Occupational exposure to proteins can thus lead to the development of ICU. Reflecting hypersensitivity to very low concentrations of allergens, investigating ICU therefore requires caution and prick tests should be performed with a diluted form of the causative protein-containing product. Causes are food, especially fruit peel, non-edible plants, cosmetic products, latex, animals.

  3. Fragrance contact allergy

    DEFF Research Database (Denmark)

    Johansen, Jeanne D

    2003-01-01

    . This gives a positive patch-test reaction in about 10% of tested patients with eczema, and the most recent estimates show that 1.7-4.1% of the general population are sensitized to ingredients of the fragrance mix. Fragrance allergy occurs predominantly in women with facial or hand eczema. These women...... development to identify contact allergy to new allergens, reflecting the continuous developments and trends in exposure....

  4. Pediatric contact dermatitis

    Directory of Open Access Journals (Sweden)

    Sharma Vinod

    2010-01-01

    Full Text Available Allergic contact dermatitis (ACD in children, until recently, was considered rare. ACD was considered as a disorder of the adult population and children were thought to be spared due to a lack of exposure to potential allergens and an immature immune system. Prevalence of ACD to even the most common allergens in children, like poison ivy and parthenium, is relatively rare as compared to adults. However, there is now growing evidence of contact sensitization of the pediatric population, and it begins right from early childhood, including 1-week-old neonates. Vaccinations, piercing, topical medicaments and cosmetics in younger patients are potential exposures for sensitization. Nickel is the most common sensitizer in almost all studies pertaining to pediatric contact dermatitis. Other common allergens reported are cobalt, fragrance mix, rubber, lanolin, thiomersol, neomycin, gold, mercapto mix, balsum of Peru and colophony. Different factors like age, sex, atopy, social and cultural practices, habit of parents and caregivers and geographic changes affect the patterns of ACD and their variable clinical presentation. Patch testing should be considered not only in children with lesions of a morphology suggestive of ACD, but in any child with dermatitis that is difficult to control.

  5. Changes in UV absorption of sunscreens after UV irradiation

    Science.gov (United States)

    Tarras-Wahlberg, N.; Stenhagen, G.; Larkö, O.; Rosén, A.; Wennberg, A.-M.; Wennerström, O.

    2000-03-01

    In the present investigation we have studied the change in the absorption spectrum of some photoactive organic species in sunscreens after UVA and UVB irradiation in a dose normally encountered during a full day in the sun. The absorbance of 2-ethylhexyl 4-methoxycinnamate was reduced significantly, while 3-(4-methylbenzyliden)camphor seemed to be rather stable. The benzophenones studied seemed to be relatively stable. In the case of 4-tert.butyl-4´-methoxy-dibenzoylmethane there was a rapid decrease in the UVA absorption leading to unsatisfactory protection in the UVA region. 4-Isopropyl-dibenzoylmethane also lost most of its UV protective capacity after irradiation with UVA. UVB seemed to have a minor effect on all the samples. The present study including gas chromatography and mass spectrometry analysis indicates that some of the photoactive organic species commonly used today in sunscreens are unstable following UV irradiation.

  6. UV and vacuum-UV biological spectroscopy using synchrotron radiation

    International Nuclear Information System (INIS)

    Ito, Amando Siuiti

    1996-01-01

    Full text. Synchrotron radiation has been used as light source in the UV and VUV region for the study of many biological systems. In the time domain, measurements are made that allow the observation of dynamics and kinetics of biomolecules like proteins and peptides, using the fluorescent properties of either intrinsic or extrinsic probes. Optical activity of groups inside biomolecules allows the use of circular dichroism techniques to generate structural information and to follow processes like protein folding. Confocal scanning of synchrotron light generates microscopy resolution below 100 nm, allowing the creation of high quality three dimensional images of biological samples, and the collection of fluorescence originated from microvolumes inside the samples. We propose a station at LNLS for these three techniques: time-resolved fluorescence, circular dischroism and confocal microscopy, using UV and VUV light. (author)

  7. UV spectrophotometry of the Metronidazole

    Directory of Open Access Journals (Sweden)

    O. I. Panasenko

    2013-10-01

    Full Text Available Objective. The purpose of this research was to study the UV spectrum of Metronidazole in different polarity solvents (water, 95 % ethanol, 0,1 M sodium hydroxide, 0,1 M hydrochloric acid and 5 M sulfuric acid solution, to establish the relationship between chemical structure of the analyzed compounds and the nature of their electronic spectrum. In addition, a detailed study of the ultraviolet spectra of Metronidazole in different solutions enables to select the optimal wavelength and a thinner design for Metronidazole in substance and dosage forms. Materials and methods. Spectrophotometer SPECORD 200-222U214 has been used for study of the UV spectra of Metronidazole, the quantitative methods were used. Measuring of the absorption of Metronidazole solutions has been carried out in quartz cuvettes with a layer thickness of 10 mm. Due to the fact that the test material shows selective absorption in the ultraviolet spectra, model compounds were studied at a concentration of 1 mg%. Study of electronic spectra was performed in the range of 200 to 400 nm, and the curve has been constructed in coordinates A = f (λ. It has been used water, 95% ethanol, 0,1 M NaOH, 0,1 M HCl and 5 M H2SO4 as solvents. The content of Metronidazole in substance and dosage forms calculated with the equations according to SPU. The results. Study of the UV spectra of Metronidazole and its model compounds showed that in short-wave part of spectrum due to absorption and excitation electrons of imidazole ring were transferred, and in long-wave – conjugation chromophore imidazole cycle and nitro group as electron acceptor occurred. Analysis of the UV spectra of Metronidazole enables to determine a maximum of the analytical quantification of the medicine. Conclusions. Metronidazole UV spectra in water, 95% ethanol, 0,1 M solution of NaOH, 0,1 M solution of HCl and 5 M solution of H2SO4 have been studied. Metronidazole UV spectra are characterized by two absorption bands in the

  8. [Sport injuries in full contact and semi-contact karate].

    Science.gov (United States)

    Greier, K; Riechelmann, H; Ziemska, J

    2014-03-01

    Karate enjoys great popularity both in professional and recreational sports and can be classified into full, half and low contact styles. The aim of this study was the analysis of sports injuries in Kyokushinkai (full contact) and traditional Karate (semi-contact). In a retrospective study design, 215 active amateur karateka (114 full contact, 101 semi-contact) were interviewed by means of a standardised questionnaire regarding typical sport injuries during the last 36 months. Injuries were categorised into severity grade I (not requiring medical treatment), grade II (single medical treatment), grade III (several outpatient medical treatments) and grade IV (requiring hospitalisation). In total, 217 injuries were reported in detail. 125 injuries (58%) occurred in full contact and 92 (42%) in semi-contact karate. The time related injury rate of full contact karateka was 1.9/1000 h compared to 1.3/1000 h of semi-contact karateka (p injuries were musculoskeletal contusions (33% full contact, 20% semi-contact), followed by articular sprains with 19% and 16%. The lower extremity was affected twice as often in full contact (40%) as in semi-contact (20%) karate. Training injuries were reported by 80% of the full contact and 77% of the semi-contact karateka. Most injuries, both in training and competition, occurred in kumite. 75% of the reported injuries of full contact and 70% of semi-contact karateka were classified as low grade (I or II). The high rate of injuries during training and kumite (sparring) points to specific prevention goals. The emphasis should be put on proprioceptive training and consistent warm-up. In the actual competition the referees play a vital role regarding prevention. © Georg Thieme Verlag KG Stuttgart · New York.

  9. Mechanical Contact Experiments and Simulations

    DEFF Research Database (Denmark)

    Nielsen, Chris Valentin; Martins, P; Zhang, W.

    2011-01-01

    Mechanical contact is studied under dynamic development by means of a combined numerical and experimental investigation. The experiments are designed to allow dynamical development of non-planar contact areas with significant expansion in all three directions as the load is increased. Different....... The overall investigation serves for testing and validating the numerical implementation of the mechanical contact, which is one of the main contributions to a system intended for 3D simulation of resistance welding. Correct modelling of contact between parts to be welded, as well as contact with electrodes......, is crucial for satisfactory modelling of the resistance welding process. The resistance heating at the contact interfaces depends on both contact area and pressure, and as the contact areas develop dynamically, the presented tests are relevant for assessing the validity and accuracy of the mechanical contact...

  10. UV DISINFECTION GUIDANCE MANUAL FOR THE ...

    Science.gov (United States)

    Provides technical information on selection, design and operation of UV systems; provides regulatory agencies with guidance and the necessary tools to assess UV systems at the design, start-up, and routine operation phase; provides manufacturers with the testing and performance standards for UV components and systems for treating drinking water. Provide guidance to water systems, regulators and manufacturers on UV disinfection of drinking water.

  11. Synthesis and characterization of UV-absorbing fluorine-silicone acrylic resin polymer

    Science.gov (United States)

    Lei, Huibin; He, Deliang; Guo, Yanni; Tang, Yining; Huang, Houqiang

    2018-06-01

    A series of UV-absorbing fluorine-silicone acrylic resin polymers containing different amount of UV-absorbent were successfully prepared by solution polymerization, with 2-[3-(2H-Benzotriazol-2-yl)-4-hydroxyphenyl] ethyl methacrylate (BHEM), vinyltrimethoxysilane (VTMS) and hexafluorobutyl methacrylate (HFMA) as modifying monomers. The acrylic polymers and the coatings thereof were characterized by Fourier transform infrared spectrum (FT-IR), X-ray photoelectron spectroscopy (XPS), Ultraviolet-visible (UV-vis) absorption spectrum, thermogravimetric analysis (TGA), water contact angle (CA) and Xenon lamp artificial accelerated aging tests. Results indicated that the resin exhibited high UV absorption performance as well as good thermal stability. The hydrophobicity of the coatings was of great improvement because of the bonded fluorine and silicone. Meanwhile, the weather-resistance was promoted through preferably colligating the protective effects of BHEM, organic fluorine and silicone. Also, a fitting formula about the weatherability with the BMHE content was tentatively proposed.

  12. UV Tanning Equipment | Radiation Protection | US EPA

    Science.gov (United States)

    2017-08-07

    Sun lamps and tanning equipment emit ultraviolet (UV) rays. People who are exposed to UV rays over a long period of time are more likely to develop skin cancer. People with light skin are in more danger because their skin is more sensitive to UV rays.

  13. An elastic-plastic contact model for line contact structures

    Science.gov (United States)

    Zhu, Haibin; Zhao, Yingtao; He, Zhifeng; Zhang, Ruinan; Ma, Shaopeng

    2018-06-01

    Although numerical simulation tools are now very powerful, the development of analytical models is very important for the prediction of the mechanical behaviour of line contact structures for deeply understanding contact problems and engineering applications. For the line contact structures widely used in the engineering field, few analytical models are available for predicting the mechanical behaviour when the structures deform plastically, as the classic Hertz's theory would be invalid. Thus, the present study proposed an elastic-plastic model for line contact structures based on the understanding of the yield mechanism. A mathematical expression describing the global relationship between load history and contact width evolution of line contact structures was obtained. The proposed model was verified through an actual line contact test and a corresponding numerical simulation. The results confirmed that this model can be used to accurately predict the elastic-plastic mechanical behaviour of a line contact structure.

  14. UV-cured polymer optics

    Science.gov (United States)

    Piñón, Victor; Santiago, Freddie; Vogelsberg, Ashten; Davenport, Amelia; Cramer, Neil

    2017-10-01

    Although many optical-quality glass materials are available for use in optical systems, the range of polymeric materials is limited. Polymeric materials have some advantages over glass when it comes to large-scale manufacturing and production. In smaller scale systems, they offer a reduction in weight when compared to glass counterparts. This is especially important when designing optical systems meant to be carried by hand. We aimed to expand the availability of polymeric materials by exploring both crown-like and flint-like polymers. In addition, rapid and facile production was also a goal. By using UV-cured thiolene-based polymers, we were able to produce optical materials within seconds. This enabled the rapid screening of a variety of polymers from which we down-selected to produce optical flats and lenses. We will discuss problems with production and mitigation strategies in using UV-cured polymers for optical components. Using UV-cured polymers present a different set of problems than traditional injection-molded polymers, and these issues are discussed in detail. Using these produced optics, we integrated them into a modified direct view optical system, with the end goal being the development of drop-in replacements for glass components. This optical production strategy shows promise for use in lab-scale systems, where low-cost methods and flexibility are of paramount importance.

  15. Contacting gases and liquids

    International Nuclear Information System (INIS)

    Robinson, L.F.; Cahalan, M.J.

    1980-01-01

    A process is described for contacting substantially immiscible phases to transfer material from one phase to another, which comprises passing the phases through a contactor, while causing portions of at least one phase to be repeatedly passed through at least one other phase. One phase in the contactor is gaseous, and another liquid. A further phase can be liquid or solid The process may be used for extracting impurities from china clay, or extracting uranium values from ore with oxygen gas acting to oxidise the uranium. (author)

  16. Precision contact level gauge

    International Nuclear Information System (INIS)

    Krejci, M.; Pilat, M.; Stulik, P.

    1977-01-01

    Equipment was developed measuring the heavy water level in the TR-0 reactor core within an accuracy of several hundredths of a millimeter in a range of around 3.5 m and at a temperature of up to 90 degC. The equipment uses a vibrating needle contact as a high sensitivity level gauge and a servomechanical system with a motion screw carrying the gauge for monitoring and measuring the level in the desired range. The advantage of the unique level gauge consists in that that the transducer converts the measured level position to an electric signal, ie., pulse width, with high sensitivity and without hysteresis. (Kr)

  17. Thermal contact conductance

    CERN Document Server

    Madhusudana, Chakravarti V

    2013-01-01

    The work covers both theoretical and practical aspects of thermal contact conductance. The theoretical discussion focuses on heat transfer through spots, joints, and surfaces, as well as the role of interstitial materials (both planned and inadvertent). The practical discussion includes formulae and data that can be used in designing heat-transfer equipment for a variety of joints, including special geometries and configurations. All of the material has been updated to reflect the latest advances in the field.

  18. Contact ionization ion source

    International Nuclear Information System (INIS)

    Hashmi, N.; Van Der Houven Van Oordt, A.J.

    1975-01-01

    An ion source in which an apertured or foraminous electrode having a multiplicity of openings is spaced from one or more active surfaces of an ionisation electrode, the active surfaces comprising a material capable of ionising by contact ionization a substance to be ionized supplied during operation to the active surface or surfaces comprises means for producing during operation a magnetic field which enables a stable plasma to be formed in the space between the active surface or surfaces and the apertured electrode, the field strength of the magnetic field being preferably in the range between 2 and 8 kilogauss. (U.S.)

  19. Mass loss and chemical structures of wheat and maize straws in response to ultraviolet-B radiation and soil contact

    Science.gov (United States)

    Zhou, Guixiang; Zhang, Jiabao; Mao, Jingdong; Zhang, Congzhi; Chen, Lin; Xin, Xiuli; Zhao, Bingzi

    2015-01-01

    The role of photodegradation, an abiotic process, has been largely overlooked during straw decomposition in mesic ecosystems. We investigated the mass loss and chemical structures of straw decomposition in response to elevated UV-B radiation with or without soil contact over a 12-month litterbag experiment. Wheat and maize straw samples with and without soil contact were exposed to three radiation levels: a no-sunlight control, ambient solar UV-B, and artificially elevated UV-B radiation. A block control with soil contact was not included. Compared with the no-sunlight control, UV-B radiation increased the mass loss by 14–19% and the ambient radiation by 9–16% for wheat and maize straws without soil contact after 12 months. Elevated UV-B exposure decreased the decomposition rates of both wheat and maize straws when in contact with soil. Light exposure resulted in decreased O-alkyl carbons and increased alkyl carbons for both the wheat and maize straws compared with no-sunlight control. The difference in soil contact may influence the contribution of photodegradation to the overall straw decomposition process. These results indicate that we must take into account the effects of photodegradation when explaining the mechanisms of straw decomposition in mesic ecosystems. PMID:26423726

  20. Mass loss and chemical structures of wheat and maize straws in response to ultraviolet-B radiation and soil contact.

    Science.gov (United States)

    Zhou, Guixiang; Zhang, Jiabao; Mao, Jingdong; Zhang, Congzhi; Chen, Lin; Xin, Xiuli; Zhao, Bingzi

    2015-10-01

    The role of photodegradation, an abiotic process, has been largely overlooked during straw decomposition in mesic ecosystems. We investigated the mass loss and chemical structures of straw decomposition in response to elevated UV-B radiation with or without soil contact over a 12-month litterbag experiment. Wheat and maize straw samples with and without soil contact were exposed to three radiation levels: a no-sunlight control, ambient solar UV-B, and artificially elevated UV-B radiation. A block control with soil contact was not included. Compared with the no-sunlight control, UV-B radiation increased the mass loss by 14-19% and the ambient radiation by 9-16% for wheat and maize straws without soil contact after 12 months. Elevated UV-B exposure decreased the decomposition rates of both wheat and maize straws when in contact with soil. Light exposure resulted in decreased O-alkyl carbons and increased alkyl carbons for both the wheat and maize straws compared with no-sunlight control. The difference in soil contact may influence the contribution of photodegradation to the overall straw decomposition process. These results indicate that we must take into account the effects of photodegradation when explaining the mechanisms of straw decomposition in mesic ecosystems.

  1. Optimal contact definition for reconstruction of Contact Maps

    Directory of Open Access Journals (Sweden)

    Stehr Henning

    2010-05-01

    Full Text Available Abstract Background Contact maps have been extensively used as a simplified representation of protein structures. They capture most important features of a protein's fold, being preferred by a number of researchers for the description and study of protein structures. Inspired by the model's simplicity many groups have dedicated a considerable amount of effort towards contact prediction as a proxy for protein structure prediction. However a contact map's biological interest is subject to the availability of reliable methods for the 3-dimensional reconstruction of the structure. Results We use an implementation of the well-known distance geometry protocol to build realistic protein 3-dimensional models from contact maps, performing an extensive exploration of many of the parameters involved in the reconstruction process. We try to address the questions: a to what accuracy does a contact map represent its corresponding 3D structure, b what is the best contact map representation with regard to reconstructability and c what is the effect of partial or inaccurate contact information on the 3D structure recovery. Our results suggest that contact maps derived from the application of a distance cutoff of 9 to 11Å around the Cβ atoms constitute the most accurate representation of the 3D structure. The reconstruction process does not provide a single solution to the problem but rather an ensemble of conformations that are within 2Å RMSD of the crystal structure and with lower values for the pairwise average ensemble RMSD. Interestingly it is still possible to recover a structure with partial contact information, although wrong contacts can lead to dramatic loss in reconstruction fidelity. Conclusions Thus contact maps represent a valid approximation to the structures with an accuracy comparable to that of experimental methods. The optimal contact definitions constitute key guidelines for methods based on contact maps such as structure prediction through

  2. Allergic contact dermatitis from octylisothiazolinone

    DEFF Research Database (Denmark)

    Mose, Anja Pahlow; Frost, Simon; Ohlund, Ulf

    2013-01-01

    Octylisothiazolinone is a biocide that has been reported as a moderate, but rare contact allergen.......Octylisothiazolinone is a biocide that has been reported as a moderate, but rare contact allergen....

  3. Diurnal changes in epidermal UV transmittance of plants in naturally high UV environments.

    Science.gov (United States)

    Barnes, Paul W; Flint, Stephan D; Slusser, James R; Gao, Wei; Ryel, Ronald J

    2008-06-01

    Studies were conducted on three herbaceous plant species growing in naturally high solar UV environments in the subalpine of Mauna Kea, Hawaii, USA, to determine if diurnal changes in epidermal UV transmittance (T(UV)) occur in these species, and to test whether manipulation of the solar radiation regime could alter these diurnal patterns. Additional field studies were conducted at Logan, Utah, USA, to determine if solar UV was causing diurnal T(UV) changes and to evaluate the relationship between diurnal changes in T(UV) and UV-absorbing pigments. Under clear skies, T(UV), as measured with a UV-A-pulse amplitude modulation fluorometer for leaves of Verbascum thapsus and Oenothera stricta growing in native soils and Vicia faba growing in pots, was highest at predawn and sunset and lowest at midday. These patterns in T(UV) closely tracked diurnal changes in solar radiation and were the result of correlated changes in fluorescence induced by UV-A and blue radiation but not photochemical efficiency (F(v)/F(m)) or initial fluorescence yield (F(o)). The magnitude of the midday reduction in T(UV) was greater for young leaves than for older leaves of Verbascum. Imposition of artificial shade eliminated the diurnal changes in T(UV) in Verbascum, but reduction in solar UV had no effect on diurnal T(UV) changes in Vicia. In Vicia, the diurnal changes in T(UV) occurred without detectable changes in the concentration of whole-leaf UV-absorbing compounds. Results suggest that plants actively control diurnal changes in UV shielding, and these changes occur in response to signals other than solar UV; however, the underlying mechanisms responsible for rapid changes in T(UV) remain unclear.

  4. High Power UV LED Industrial Curing Systems

    Energy Technology Data Exchange (ETDEWEB)

    Karlicek, Robert, F., Jr; Sargent, Robert

    2012-05-14

    UV curing is a green technology that is largely underutilized because UV radiation sources like Hg Lamps are unreliable and difficult to use. High Power UV LEDs are now efficient enough to replace Hg Lamps, and offer significantly improved performance relative to Hg Lamps. In this study, a modular, scalable high power UV LED curing system was designed and tested, performing well in industrial coating evaluations. In order to achieve mechanical form factors similar to commercial Hg Lamp systems, a new patent pending design was employed enabling high irradiance at long working distances. While high power UV LEDs are currently only available at longer UVA wavelengths, rapid progress on UVC LEDs and the development of new formulations designed specifically for use with UV LED sources will converge to drive more rapid adoption of UV curing technology. An assessment of the environmental impact of replacing Hg Lamp systems with UV LED systems was performed. Since UV curing is used in only a small portion of the industrial printing, painting and coating markets, the ease of use of UV LED systems should increase the use of UV curing technology. Even a small penetration of the significant number of industrial applications still using oven curing and drying will lead to significant reductions in energy consumption and reductions in the emission of green house gases and solvent emissions.

  5. Effects of Relative Humidity and Spraying Medium on Ultraviolet (UV) Decontamination of Filters Loaded with Viral Aerosols

    Science.gov (United States)

    2012-02-01

    as can chloramines (F. J. Madeline, personal communication). The use of direct microwave irradiation to kill microorganisms through thermal and...transmission modes as a function of UV irradiation time in different nebulizer media. UV Disinfection of Filters August 2012 Volume 78 Number 16 aem.asm.org...at contact. The equation for evaporation time is the following (11): tevaporation time Rpdd 2 8DvM pdTd p T (2) where R is the ideal gas law

  6. Microbial UV fluence-response assessment using a novel UV-LED collimated beam system.

    Science.gov (United States)

    Bowker, Colleen; Sain, Amanda; Shatalov, Max; Ducoste, Joel

    2011-02-01

    A research study has been performed to determine the ultraviolet (UV) fluence-response of several target non-pathogenic microorganisms to UV light emitting diodes (UV-LEDs) by performing collimated beam tests. UV-LEDs do not contain toxic mercury, offer design flexibility due to their small size, and have a longer operational life than mercury lamps. Comsol Multiphysics was utilized to create an optimal UV-LED collimated beam design based on number and spacing of UV-LEDs and distance of the sample from the light source while minimizing the overall cost. The optimized UV-LED collimated beam apparatus and a low-pressure mercury lamp collimated beam apparatus were used to determine the UV fluence-response of three surrogate microorganisms (Escherichia coli, MS-2, T7) to 255 nm UV-LEDs, 275 nm UV-LEDs, and 254 nm low-pressure mercury lamps. Irradiation by low-pressure mercury lamps produced greater E. coli and MS-2 inactivation than 255 nm and 275 nm UV-LEDs and similar T7 inactivation to irradiation by 275 nm UV-LEDs. The 275 nm UV-LEDs produced more efficient T7 and E. coli inactivation than 255 nm UV-LEDs while both 255 nm and 275 nm UV-LEDs produced comparable microbial inactivation for MS-2. Differences may have been caused by a departure from the time-dose reciprocity law due to microbial repair mechanisms. Copyright © 2010 Elsevier Ltd. All rights reserved.

  7. Degradation study of different brands of paracetamol by UV spectroscopy

    Directory of Open Access Journals (Sweden)

    Safila Naveed

    2016-05-01

    Full Text Available Objective: To investgate the forced degradation study for the determination of degradation of the drug substance. Methods: Paracetamol was exposed to different conditions according to International Conference on Harmonization guideline. The amount of degradation product can be calculated with the help of UV spectrophotometer. The official test limits according to British Pharmacopoeia/United States Pharmacopoeia should not less than and should not more than lapelled amount. Forced degradation of drug substance was exposed to acidic and basic medium of panadol. Forced degradation of drug substance of panadol, disprol and calpol were also observed negligible difference in availability on exposure to UV and heat. This method can be used successfully for studying the stress degradation factors. Because this method is less time consuming and simple and cost effective also. Results: The brands i.e. calpol, panadol and disprol, when they come in contact with different degradation parameters (before, acid, base, heat and UV treatments according to statistical analysis, the result showed significant values (P < 0.05 which indicated that there was no degradation in any of the brand. Conclusions: The result indicated there is no degradation found in these brands.

  8. Ecotoxicological effect characterisation of widely used organic UV filters.

    Science.gov (United States)

    Kaiser, D; Sieratowicz, A; Zielke, H; Oetken, M; Hollert, H; Oehlmann, J

    2012-04-01

    Chemical UV filters are used in sun protection and personal care products in order to protect consumers from skin cancer induced by ultraviolet (UV) radiation. The present study aims to evaluate the effects of three common UV filters butyl-methoxydibenzoylmethane (B-MDM) ethylhexyl-methoxycinnamate (EHMC) and octocrylene (OCR) on aquatic organism, focussing particularly on infaunal and epibentic invertebrates (Chironomus riparius, Lumbriculus variegatus, Melanoides tuberculata and Potamopyrgus antipodarum). Due to their life habits, these organism are especially affected by lipophilic substances. Additionally, two direct sediment contact assays utilising zebra fish (Danio rerio) embryos and bacteria (Arthrobacter globiformis) were conducted. EHMC caused a toxic effect on reproduction in both snails with lowest observed effect concentrations (LOEC) of 0.4 mg/kg (Potamopyrgus antipodarum) and 10 mg/kg (Melanoides tuberculata). At high concentrations sublethal effects could be observed for D. rerio after exposure to EHMC (NOEC 100 mg/kg). B-MDM and OCR showed no effects on any of the tested organism. Copyright © 2011 Elsevier Ltd. All rights reserved.

  9. Temporal variation of optimal UV exposure time over Korea: risks and benefits of surface UV radiation

    Science.gov (United States)

    Lee, Y. G.; Koo, J. H.

    2015-12-01

    Solar UV radiation in a wavelength range between 280 to 400 nm has both positive and negative influences on human body. Surface UV radiation is the main natural source of vitamin D, providing the promotion of bone and musculoskeletal health and reducing the risk of a number of cancers and other medical conditions. However, overexposure to surface UV radiation is significantly related with the majority of skin cancer, in addition other negative health effects such as sunburn, skin aging, and some forms of eye cataracts. Therefore, it is important to estimate the optimal UV exposure time, representing a balance between reducing negative health effects and maximizing sufficient vitamin D production. Previous studies calculated erythemal UV and vitamin-D UV from the measured and modelled spectral irradiances, respectively, by weighting CIE Erythema and Vitamin D3 generation functions (Kazantzidis et al., 2009; Fioletov et al., 2010). In particular, McKenzie et al. (2009) suggested the algorithm to estimate vitamin-D production UV from erythemal UV (or UV index) and determined the optimum conditions of UV exposure based on skin type Ⅱ according to the Fitzpatrick (1988). Recently, there are various demands for risks and benefits of surface UV radiation on public health over Korea, thus it is necessary to estimate optimal UV exposure time suitable to skin type of East Asians. This study examined the relationship between erythemally weighted UV (UVEry) and vitamin D weighted UV (UVVitD) over Korea during 2004-2012. The temporal variations of the ratio (UVVitD/UVEry) were also analyzed and the ratio as a function of UV index was applied in estimating the optimal UV exposure time. In summer with high surface UV radiation, short exposure time leaded to sufficient vitamin D and erythema and vice versa in winter. Thus, the balancing time in winter was enough to maximize UV benefits and minimize UV risks.

  10. Fragrance contact allergy

    DEFF Research Database (Denmark)

    Johansen, Jeanne D

    2003-01-01

    in the same products. This means that it is difficult to avoid exposure, as products labelled as 'fragrance free' have also been shown to contain fragrance ingredients, either because of the use of fragrance ingredients as preservatives or masking perfumes, or the use of botanicals. About 2500 different...... fragrance ingredients are currently used in the composition of perfumes and at least 100 of these are known contact allergens. Therefore, it is advisable to supplement standard patch testing with the patient's own stay-on cosmetic products, as well as the fragrance chemical hydroxyisohexyl-3-cyclohexane...... carboxaldehyde, which on its own gives responses in 1-3% of tested patients. The focus in recent years on the ingredients of the fragrance mix will probably result in the fragrance industry changing the composition of perfumes, and thus make the current diagnostic test less useful. New diagnostic tests are under...

  11. Cosmetic Contact Allergens

    Directory of Open Access Journals (Sweden)

    An Goossens

    2016-02-01

    Full Text Available This article presents trends in the frequency of cosmetics as causal factors of allergic contact dermatitis during a 26-year period in 14,911 patients patch-tested between 1990 and 2014, and discusses the cosmetic allergens identified during the last six years (2010–2015 in 603 patients out of 3105 tested. The data were retrieved from, and evaluated with, a patient database developed in-house. The results show the increasing importance of cosmetic allergies, up to 25% of the patients tested during the last five-year period. As expected, fragrance materials, preservatives, and hair dyes were the most frequent culprits, but a great variety of other allergenic ingredients were involved as well. This underlines the need of additional and extensive patch testing with the patient’s products used and their ingredients.

  12. Hair dye contact allergy

    DEFF Research Database (Denmark)

    Søsted, Heidi; Rastogi, Suresh Chandra; Andersen, Klaus Ejner

    2004-01-01

    Colouring of hair can cause severe allergic contact dermatitis. The most frequently reported hair dye allergens are p-phenylenediamine (PPD) and toluene-2,5-diamine, which are included in, respectively, the patch test standard series and the hairdressers series. The aim of the present study...... was to identify dye precursors and couplers in hair dyeing products causing clinical hair dye dermatitis and to compare the data with the contents of these compounds in a randomly selected set of similar products. The patient material comprised 9 cases of characteristic clinical allergic hair dye reaction, where...... exposure history and patch testing had identified a specific hair dye product as the cause of the reaction. The 9 products used by the patients were subjected to chemical analysis. 8 hair dye products contained toluene-2,5-diamine (0.18 to 0.98%). PPD (0.27%) was found in 1 product, and m-aminophenol (0...

  13. Mechanoluminescent Contact Type Sensor

    Directory of Open Access Journals (Sweden)

    A. K. Yefremov

    2017-01-01

    Full Text Available Mechanoluminescent sensing elements convert mechanical stress into optical radiation. Advantages of such sensors are the ability to generate an optical signal, solid-state, simple structure, and resistance to electromagnetic interference. Mechanoluminescent sensor implementations can possess the concentrated and distributed sensitivity, thereby allowing us to detect the field of mechanical stresses distributed across the area and in volume. Most modern semiconductor photo-detectors can detect mechanoluminescent radiation, so there are no difficulties to provide its detection when designing the mechanoluminescent sensing devices. Mechanoluminescent substances have especial sensitivity to shock loads, and this effect can be used to create a fuse the structure of which includes a target contact type sensor with a photosensitive actuator. The paper briefly describes the theoretical basics of mechanoluminiscence: a light signal emerges from the interaction of crystalline phosphor luminescence centers with electrically charged dislocations, moving due to the deformation of the crystal. A mathematical model of the mechanoluminescent conversion is represented as a functional interaction between parameters of the mechanical shock excitation and the sensor light emission. Examples of computing the optical mechanoluminescent output signal depending on the duration and peak level of impulse load are given. It is shown that the luminous flux, generated by mechanoluminescent sensing element when there is an ammunition-target collision causes the current emerging in photo-detector (photodiode that is sufficient for a typical actuator of the fuse train to operate. The potential possibility to create a contact target type sensor based on the light-sensitive mechanoluminescent sensor was proved by the calculation and simulation results.

  14. Reducing contact resistance in graphene devices through contact area patterning.

    Science.gov (United States)

    Smith, Joshua T; Franklin, Aaron D; Farmer, Damon B; Dimitrakopoulos, Christos D

    2013-04-23

    Performance of graphene electronics is limited by contact resistance associated with the metal-graphene (M-G) interface, where unique transport challenges arise as carriers are injected from a 3D metal into a 2D-graphene sheet. In this work, enhanced carrier injection is experimentally achieved in graphene devices by forming cuts in the graphene within the contact regions. These cuts are oriented normal to the channel and facilitate bonding between the contact metal and carbon atoms at the graphene cut edges, reproducibly maximizing "edge-contacted" injection. Despite the reduction in M-G contact area caused by these cuts, we find that a 32% reduction in contact resistance results in Cu-contacted, two-terminal devices, while a 22% reduction is achieved for top-gated graphene transistors with Pd contacts as compared to conventionally fabricated devices. The crucial role of contact annealing to facilitate this improvement is also elucidated. This simple approach provides a reliable and reproducible means of lowering contact resistance in graphene devices to bolster performance. Importantly, this enhancement requires no additional processing steps.

  15. Contact angle and local wetting at contact line.

    Science.gov (United States)

    Li, Ri; Shan, Yanguang

    2012-11-06

    This theoretical study was motivated by recent experiments and theoretical work that had suggested the dependence of the static contact angle on the local wetting at the triple-phase contact line. We revisit this topic because the static contact angle as a local wetting parameter is still not widely understood and clearly known. To further clarify the relationship of the static contact angle with wetting, two approaches are applied to derive a general equation for the static contact angle of a droplet on a composite surface composed of heterogeneous components. A global approach based on the free surface energy of a thermodynamic system containing the droplet and solid surface shows the static contact angle as a function of local surface chemistry and local wetting state at the contact line. A local approach, in which only local forces acting on the contact line are considered, results in the same equation. The fact that the local approach agrees with the global approach further demonstrates the static contact angle as a local wetting parameter. Additionally, the study also suggests that the wetting described by the Wenzel and Cassie equations is also the local wetting of the contact line rather than the global wetting of the droplet.

  16. Equilibrium contact angle or the most-stable contact angle?

    Science.gov (United States)

    Montes Ruiz-Cabello, F J; Rodríguez-Valverde, M A; Cabrerizo-Vílchez, M A

    2014-04-01

    It is well-established that the equilibrium contact angle in a thermodynamic framework is an "unattainable" contact angle. Instead, the most-stable contact angle obtained from mechanical stimuli of the system is indeed experimentally accessible. Monitoring the susceptibility of a sessile drop to a mechanical stimulus enables to identify the most stable drop configuration within the practical range of contact angle hysteresis. Two different stimuli may be used with sessile drops: mechanical vibration and tilting. The most stable drop against vibration should reveal the changeless contact angle but against the gravity force, it should reveal the highest resistance to slide down. After the corresponding mechanical stimulus, once the excited drop configuration is examined, the focus will be on the contact angle of the initial drop configuration. This methodology needs to map significantly the static drop configurations with different stable contact angles. The most-stable contact angle, together with the advancing and receding contact angles, completes the description of physically realizable configurations of a solid-liquid system. Since the most-stable contact angle is energetically significant, it may be used in the Wenzel, Cassie or Cassie-Baxter equations accordingly or for the surface energy evaluation. © 2013 Elsevier B.V. All rights reserved.

  17. Contact and Non-contact Measurements of Grinding Pins

    Directory of Open Access Journals (Sweden)

    Magdziak Marek

    2015-01-01

    Full Text Available The paper presents the results of contact and non-contact measurements of external profiles of selected grinding pins. The measurements were conducted in order to choose the appropriate measuring technique in the case of the considered measurement task. In the case of contact measurements the coordinate measuring machine ACCURA II was applied. The used coordinate measuring machine was equipped with the contact scanning probe VAST XT and the Calypso inspection software. Contact coordinate measurements were performed by using of different measurement strategies. The applied strategies included different scanning velocities and distances between measured points. Non-contact measurements were conducted by means of the tool presetter produced by the Mahr company. On the basis of gained results the guidelines concerning measurements of grinding pins were formulated. The measurements of analyzed grinding pins performed by means of the non-contact measuring system are characterized by higher reproducibility than the contact measurements. The low reproducibility of contact measurements may be connected with the inaccuracy of the selected coordinate measuring machine and the measuring probe, the measurement parameters and environmental conditions in the laboratory where the coordinate measuring machine is located. Moreover, the paper presents the possible application of results of conducted investigations. The results of non-contact measurements can be used in the simulation studies of grinding processes. The simulations may reduce the costs of machining processes.

  18. COMPARATIVE ANALYSIS OF UV-C AND UV-B RADIATION INFLUENCE ON PLANT OBJECTS

    Directory of Open Access Journals (Sweden)

    О. Міхєєв

    2011-04-01

    Full Text Available General aim of work – comparative research of temporal regularities of growth processes of pea,that was grown under normal conditions and with application of UV-C and UV-B irradiation ofstem part, and also detection of irradiation dose relations to parameter of root and stem part sproutsgrowth rate of Aronis pea. Research subject of UV-C and UV-B irradiation influence on dynamicsof plant growth parameters in each set of experiments was alteration of growth rate, pecularities ofgrowth dynamics in different conditions of experiment, detection of UV-C and UV-B irradiationdoses range, that stimulate or inhibit growth parameters of pea sprouts. The investigation resulted indetermination 1,3 times higher efficiency of UV-V irradiation comparing to UV-B irradiation.Reaction of root didn’t depend on the type of UV-radiation

  19. In Vitro Model for Predicting the Protective Effect of Ultraviolet-Blocking Contact Lens in Human Corneal Epithelial Cells.

    Science.gov (United States)

    Abengózar-Vela, Antonio; Arroyo, Cristina; Reinoso, Roberto; Enríquez-de-Salamanca, Amalia; Corell, Alfredo; González-García, María Jesús

    2015-01-01

    To develop an in vitro method to determine the protective effect of UV-blocking contact lenses (CLs) in human corneal epithelial (HCE) cells exposed to UV-B radiation. SV-40-transformed HCE cells were covered with non-UV-blocking CL, UV-blocking CL or not covered, and exposed to UV-B radiation. As control, HCE cells were covered with both types of CLs or not covered, but not exposed to UV-B radiation. Cell viability at 24, 48 and 72 h, after UV-B exposure and removing CLs, was determined by alamarBlue(®) assay. Percentage of live, dead and apoptotic cells was also assessed by flow cytometry after 24 h of UV-B exposure. Intracellular reactive oxygen species (ROS) production after 1 h of exposure was assessed using the dye H(2)DCF-DA. Cell viability significantly decreased, apoptotic cells and intracellular ROS production significantly increased when UVB-exposed cells were covered with non-UV-blocking CL or not covered compared to non-irradiated cells. When cells were covered with UV-blocking CL, cell viability significantly increased and apoptotic cells and intracellular ROS production did not increase compared to exposed cells. UV-B radiation induces cell death by apoptosis, increases ROS production and decreases viable cells. UV-blocking CL is able to avoid these effects increasing cell viability and protecting HCE cells from apoptosis and ROS production induced by UV-B radiation. This in vitro model is an alternative to in vivo methods to determine the protective effect of UV-blocking ophthalmic biomaterials because it is a quicker, cheaper and reliable model that avoids the use of animals.

  20. Intensification of UV-C tertiary treatment: Disinfection and removal of micropollutants by sulfate radical based Advanced Oxidation Processes.

    Science.gov (United States)

    Rodríguez-Chueca, J; García-Cañibano, C; Lepistö, R-J; Encinas, Á; Pellinen, J; Marugán, J

    2018-04-21

    This study explores the enhancement of UV-C tertiary treatment by sulfate radical based Advanced Oxidation Processes (SR-AOPs), including photolytic activation of peroxymonosulfate (PMS) and persulfate (PS) and their photocatalytic activation using Fe(II). Their efficiency was assessed both for the inactivation of microorganisms and the removal or micropollutants (MPs) in real wastewater treatment plant effluents. Under the studied experimental range (UV-C dose 5.7-57 J/L; UV-C contact time 3 to 28 s), the photolysis of PMS and PS (0.01 mM) increased up to 25% the bacterial removal regarding to UV-C system. The photolytic activation of PMS led to the total inactivation of bacteria (≈ 5.70 log) with the highest UV-C dose (57 J/L). However, these conditions were insufficient to remove the MPs, being required oxidant's dosages of 5 mM to remove above 90% of carbamazepine, diclofenac, atenolol and triclosan. The best efficiencies were achieved by the combination of PMS or PS with Fe(II), leading to the total removal of the MPs using a low UV-C dosage (19 J/L), UV-C contact time (9 s) and reagent's dosages (0.5 mM). Finally, high mineralization was reached (>50%) with photocatalytic activation of PMS and PS even with low reagent's dosages. Copyright © 2018 Elsevier B.V. All rights reserved.

  1. Contextualizing Intergroup Contact: Do Political Party Cues Enhance Contact Effects?

    DEFF Research Database (Denmark)

    Sønderskov, Kim Mannemar; Thomsen, Jens Peter Frølund

    2015-01-01

    This article examines intergroup contact effects in different political contexts. We expand on previous efforts of social psychologists by incorporating the messages of political parties as a contextual trigger of group membership awareness in contact situations. We argue that the focus among...... political parties on us-them categorizations heightens the awareness of group memberships. This focus in turn enhances the positive intergroup contact effect by stimulating majority members to perceive contacted persons as prototypical outgroup members. A multilevel analysis of 22 countries and almost 37......,000 individuals confirms that the ability of intergroup contact to reduce antiforeigner sentiment increases when political parties focus intensively on immigration issues and cultural differences. Specifically, both workplace contact and interethnic friendship become more effective in reducing antiforeigner...

  2. UV lamp for photoelectron spectroscopy

    International Nuclear Information System (INIS)

    Cardoso, M.J.B.; Landers, R.; Sundaram, V.S.

    1983-01-01

    An UV lamp and a differential pumping system which enables to couple the lamp to an ultra-high vacuum chamber (10 -9 torr) without using windows, are described. The differential between the pressure inside the discharge chamber and the one in de UHV region, which is of 10 8 -10 9 , is achieved with two pumping states separated by pyrex capillaries having an internal diameter of 0.6 mm. In the first stage, a mechanical pump (10 -3 torr) is used; in the second stage, a diffusor pump with a cryogenic trap (N 2 liq - 10 -7 torr) is employed. The lamp produces, when used with high purity He, narrow lines almost clear at 21.2 eV and 40.8 eV, depending on the discharge chamber pressure, thus eliminating the need of a monochromator. As a high voltage source (3 KV), a commercial unit with a good current control was used, ensuring UV beam stability - an essential characteristic for this lamp if it is employed for photoelectron excitation of crystalline samples. (C.L.B.) [pt

  3. Efficiency of ocular UV protection by clear lenses.

    Science.gov (United States)

    Rifai, Katharina; Hornauer, Matthias; Buechinger, Ramona; Schoen, Roland; Barraza-Bernal, Maria; Habtegiorgis, Selam; Glasenapp, Carsten; Wahl, Siegfried; Mappes, Timo

    2018-04-01

    Ocular UV doses accumulate all-day, not only during periods of direct sun exposure. The UV protection efficiency of three clear lenses was evaluated experimentally, validated by simulation, and compared to non-UV protection: a first spectacle lens with a tailored UV absorber, a second spectacle lens, minimizing UV back reflections, as well as a third spectacle lens, combining both. A tailored UV-absorber efficiently reduced overall UV irradiance to 7 %, whereas reduction of back-reflections still left UV irradiance at 42 %. Thus, clear lenses with a tailored UV absorber efficiently protect the eye from UV, supplementing sun glasses wear to an all-day protection scenario.

  4. Effects of UV radiation on freshwater metazooplankton

    International Nuclear Information System (INIS)

    Tartarotti, B.

    1999-06-01

    There is evidence that fluxes of solar ultraviolet-B radiation (UV-B, 290-320 nm) are increasing over wide parts of the earth's surface due to stratospheric ozone depletion. UV radiation (290-400 nm) can have damaging effects on biomolecules and cell components that are common to most living organisms. The aim of this thesis is to gain a more thorough understanding of the potential impacts of solar radiation on freshwater metazooplankton. To detect UV-vulnerability in zooplankton populations dominating the zooplankton community of two clear-water, high mountain lakes located one in the Austrian Alps and another in the Chilean Andes, the survival of two copepod species was studied. The organisms were exposed to a 10- to 100-fold increase in UV-B radiation compared to those levels found at their natural, maximum daytime distribution. Both species vertically migrate and are pigmented. UV-absorbing compounds with a maximum absorption at ∼334 nm were also detected. Cyclops abyssorum tatricus, a common cyclopoid copepod species of Alpine lakes, was highly resistant to UV-B radiation and no significant lethal effect was observed. The calanoid copepod Boeckella gracilipes, frequent in Andean lakes, had a mortality ∼5 times higher in the treatment receiving full sunlight than in the UV-B excluded treatment (3.2 %) only when exposed for 70 h. The resistance of B. gracilipes was higher than that reported in the literature for the same species suggesting the existence of intraspecific differences in UV sensitivity. Survival, fecundity and development of the zooplankton community of a clear-water, high elevation Andean lake (33 o S) were studied with mesocosms experiments after prolonged UV exposure (48 days). When exposed to full sunlight, the population of the cladoceran Chydorus sphaericus and the rotifer Lepadella ovalis were strongly inhibited by UV-B, whereas both species were resistant to UV-A radiation. Conversely, UV-B radiation had no effect on the survival of the

  5. [Light protection: principles of UV protection].

    Science.gov (United States)

    Stege, H; Mang, R

    2006-05-01

    UV radiation is responsible for the induction of epithelial and melanocytic skin cancer, photoaging, and photodermatoses. UV protection is necessary to prevent damage caused by non-physiologic exposure. UV protection includes not only reduction of sun exposure but also use of sun protective filters, UV protective clothes, DNA repair enzymes, and antioxidant supplementation. Consumers are uncertain about the possibilities and limitations of commercial sun protection measures. Dermatologists must explain protective measures to the general public which continues to believe that UV-tanned skin is healthy. The sunscreen market is a highly competitive but lucrative market. The range of products with different designations and promises makes difficult for both consumers and dermatologists to determine what is sensible UV protection.

  6. Quaternionic contact Einstein structures and the quaternionic contact Yamabe problem

    CERN Document Server

    Ivanov, Stefan; Vassilev, Dimiter

    2014-01-01

    A partial solution of the quaternionic contact Yamabe problem on the quaternionic sphere is given. It is shown that the torsion of the Biquard connection vanishes exactly when the trace-free part of the horizontal Ricci tensor of the Biquard connection is zero and this occurs precisely on 3-Sasakian manifolds. All conformal transformations sending the standard flat torsion-free quaternionic contact structure on the quaternionic Heisenberg group to a quaternionic contact structure with vanishing torsion of the Biquard connection are explicitly described. A "3-Hamiltonian form" of infinitesimal conformal automorphisms of quaternionic contact structures is presented.

  7. [Contact glass tonometer].

    Science.gov (United States)

    Dekker, P W; Kanngiesser, H; Robert, Y C

    1996-05-01

    This paper presents a tonometer built into a contactlens, which allows to measure the eye-pressure and to perform ophthalmoscopy at the same time. Artificially induced changes of the eye-pressure and their influence on the visible fundus can now be checked simultaneously. The contactlens-tonometer (CGT) also is able to record continuously the pulse-curve, which can indicate any circulatory problem. So, the device is expected to give us additional diagnostic criteria of early glaucoma. Each ophthalmologyst in the field will be able to perform with this device a oculodynamometry in an easy way. By this it is possible to estimate the pressure-tolerance of the optic disk from glaucoma-patients. There have been taken some measurements on enucleated human eyes, comparing our device with a Statham-transducer in the vitreous. We found a good correlation. In a second step, we made measurements (65) on healthy volunteers, comparing the device with Perkins-Tonometry. We found a correlation (R = 0.58). The error of the measurements was about +/- 3 mm Hg. Considering both, the deviation of the Perkins-Tonometer with which our results were compared, and the fact of a good correlation (R = 0.999) in the study with the enucleated human eyes, we found that the contact-lens-tonometer measures the intraocular pressure exactly. In future studies, we want to analyze the dynamic component of the measurements.

  8. Contact sport and osteoarthritis.

    LENUS (Irish Health Repository)

    Molloy, Michael G

    2011-04-01

    Osteoarthritis (OA) is the most common joint disease in the world and the single largest cause of disability for those over 18 years. It affects more than twice as many people as does cardiac disease, and increases in incidence and prevalence with age. Animal and human studies have shown no evidence of increased risk of hip or knee OA with moderate exercise and in the absence of traumatic injury, sporting activity has a protective effect. One age-matched case control study found recreational runners who ran 12-14 miles per week for up to 40 years had no increase in radiological or symptomatic hip or knee OA. However, higher rates of hip OA occur in contact sports than in age-matched controls, with the highest rate in professional players. Soccer players with torn anterior cruciate ligaments (ACL) are more likely to develop knee OA than those with intact ACL. Early ACL repair reduces the risk of knee OA, but does not prevent it. Established injury prevention programmes have been refined to prevent injuries such as ACL rupture.

  9. UV-Induced Cell Death in Plants

    Science.gov (United States)

    Nawkar, Ganesh M.; Maibam, Punyakishore; Park, Jung Hoon; Sahi, Vaidurya Pratap; Lee, Sang Yeol; Kang, Chang Ho

    2013-01-01

    Plants are photosynthetic organisms that depend on sunlight for energy. Plants respond to light through different photoreceptors and show photomorphogenic development. Apart from Photosynthetically Active Radiation (PAR; 400–700 nm), plants are exposed to UV light, which is comprised of UV-C (below 280 nm), UV-B (280–320 nm) and UV-A (320–390 nm). The atmospheric ozone layer protects UV-C radiation from reaching earth while the UVR8 protein acts as a receptor for UV-B radiation. Low levels of UV-B exposure initiate signaling through UVR8 and induce secondary metabolite genes involved in protection against UV while higher dosages are very detrimental to plants. It has also been reported that genes involved in MAPK cascade help the plant in providing tolerance against UV radiation. The important targets of UV radiation in plant cells are DNA, lipids and proteins and also vital processes such as photosynthesis. Recent studies showed that, in response to UV radiation, mitochondria and chloroplasts produce a reactive oxygen species (ROS). Arabidopsis metacaspase-8 (AtMC8) is induced in response to oxidative stress caused by ROS, which acts downstream of the radical induced cell death (AtRCD1) gene making plants vulnerable to cell death. The studies on salicylic and jasmonic acid signaling mutants revealed that SA and JA regulate the ROS level and antagonize ROS mediated cell death. Recently, molecular studies have revealed genes involved in response to UV exposure, with respect to programmed cell death (PCD). PMID:23344059

  10. UV Light Induces Dedoping of Polyaniline

    Directory of Open Access Journals (Sweden)

    Yuki Kaitsuka

    2016-01-01

    Full Text Available UV (Ultra-Violet light-driven change in optical absorption of polyaniline (PANI is reported. Irradiation of UV light to PANI/camphor sulfonic acid prepared by electrochemical polymerization allows dedoping of the PANI. Especially, UV light irradiation in the presence of a radical trap agent effectively reduces (dedoping the PANI. The result in this study is quite simple; however, this may be a first report for light-induced dedoping (color change of a conductive polymer.

  11. UV disinfection in drinking water supplies.

    Science.gov (United States)

    Hoyer, O

    2000-01-01

    UV disinfection has become a practical and safely validatable disinfection procedure by specifying the requirements for testing and monitoring in DVGW standard W 294. A standardized biodosimetric testing procedure and monitoring with standardized UV sensors is introduced and successfully applied. On-line monitoring of irradiance can be counterchecked with handheld reference sensors and makes it possible that UV systems can be used for drinking water disinfection with the same level of confidence and safety as is conventional chemical disinfection.

  12. UV-Surface Treatment of Fungal Resistant Polyether Polyurethane Film-Induced Growth of Entomopathogenic Fungi.

    Science.gov (United States)

    Lando, Gabriela Albara; Marconatto, Letícia; Kessler, Felipe; Lopes, William; Schrank, Augusto; Vainstein, Marilene Henning; Weibel, Daniel Eduardo

    2017-07-18

    Synthetic polymers are the cause of some major environmental impacts due to their low degradation rates. Polyurethanes (PU) are widely used synthetic polymers, and their growing use in industry has produced an increase in plastic waste. A commercial polyether-based thermoplastic PU with hydrolytic stability and fungus resistance was only attacked by an entomopathogenic fungus, Metarhiziumanisopliae , when the films were pre-treated with Ultraviolet (UV) irradiation in the presence of reactive atmospheres. Water contact angle, Fourier transform infrared spectroscopy in attenuated total reflection mode (FTIR-ATR), scanning electron microscopy (SEM), and profilometer measurements were mainly used for analysis. Permanent hydrophilic PU films were produced by the UV-assisted treatments. Pristine polyether PU films incubated for 10, 30, and 60 days did not show any indication of fungal growth. On the contrary, when using oxygen in the UV pre-treatment a layer of fungi spores covered the sample, indicating a great adherence of the microorganisms to the polymer. However, if acrylic acid vapors were used during the UV pre-treatment, a visible attack by the entomopathogenic fungi was observed. SEM and FTIR-ATR data showed clear evidence of fungal development: growth and ramifications of hyphae on the polymer surface with the increase in UV pre-treatment time and fungus incubation time. The results indicated that the simple UV surface activation process has proven to be a promising alternative for polyether PU waste management.

  13. Characterization of ZnO coated polyester fabrics for UV protection

    International Nuclear Information System (INIS)

    Broasca, G.; Borcia, G.; Dumitrascu, N.; Vrinceanu, N.

    2013-01-01

    The textile industry aims to develop fabrics adapted to environmental conditions, in particular to UV radiation. Taking into account the demand for such materials, we prepare an inorganic–organic material, based on ZnO microparticles impregnation of polyester textiles, to perform combined UV-protection properties and high hydrophobicity. Scanning electron microscopy, UV reflectance, Impedance Spectroscopy, contact angle, air permeability, resistance to vapor transfer and tensile strength measurement are used for analysis of the surface and volume properties, related to the performance of the material under environmental conditions, as UV radiation, water and water vapors. The impregnation method ensures a good homogeneity and dispersion of ZnO microparticles into the textile polymeric matrix. The optimum level of impregnation of the fabrics is established to 3–5% ZnO, yielding stable properties, without overloading the fabric. The response of the coated polymer indicates better absorbing the UV radiation and dissipating the surface charge, time stability against UV and higher hydrophobic character, without modification of the mechanical properties, offering enhanced performance and comfort under environmental conditions.

  14. UV-Surface Treatment of Fungal Resistant Polyether Polyurethane Film-Induced Growth of Entomopathogenic Fungi

    Directory of Open Access Journals (Sweden)

    Gabriela Albara Lando

    2017-07-01

    Full Text Available Synthetic polymers are the cause of some major environmental impacts due to their low degradation rates. Polyurethanes (PU are widely used synthetic polymers, and their growing use in industry has produced an increase in plastic waste. A commercial polyether-based thermoplastic PU with hydrolytic stability and fungus resistance was only attacked by an entomopathogenic fungus, Metarhiziumanisopliae, when the films were pre-treated with Ultraviolet (UV irradiation in the presence of reactive atmospheres. Water contact angle, Fourier transform infrared spectroscopy in attenuated total reflection mode (FTIR-ATR, scanning electron microscopy (SEM, and profilometer measurements were mainly used for analysis. Permanent hydrophilic PU films were produced by the UV-assisted treatments. Pristine polyether PU films incubated for 10, 30, and 60 days did not show any indication of fungal growth. On the contrary, when using oxygen in the UV pre-treatment a layer of fungi spores covered the sample, indicating a great adherence of the microorganisms to the polymer. However, if acrylic acid vapors were used during the UV pre-treatment, a visible attack by the entomopathogenic fungi was observed. SEM and FTIR-ATR data showed clear evidence of fungal development: growth and ramifications of hyphae on the polymer surface with the increase in UV pre-treatment time and fungus incubation time. The results indicated that the simple UV surface activation process has proven to be a promising alternative for polyether PU waste management.

  15. The UV Survey Mission Concept, CETUS

    Science.gov (United States)

    Heap, Sara; and the CETUS Team

    2018-01-01

    In March 2017, NASA selected CETUS for study of a Probe-class mission concept. W. Danchi is the CETUS PI, and S. Heap is the Science PI. CETUS is primarily a UV survey telescope to complement survey telescopes of the 2020’s including E-ROSITA, Subaru Hyper Suprime Cam and Prime-Focus Spectrograph, WFIRST, and the Square Kilometer Array. CETUS comprises a 1.5-m wide-field telescope and three science instruments: a wide-field (1045” on a side) far-UV and near-UV camera; a similarly wide-field near-UV multi-object spectrograph utilizing a next-generation micro-shutter array; and a single-object spectrograph with options of spectral region (far-UV or near-UV) and spectral resolving power (2,000 or 40,000). The survey instruments will operate simultaneously thereby producing wide-field images in the near-UV and far-UV and a spectrogram containing near-UV spectra of up to 100 sources free of spectral overlap and astronomical background. ln concert with other survey telescopes, CETUS will focus on understanding galaxy evolution at cosmic noon (z~1-2).

  16. The importance of contact quality

    DEFF Research Database (Denmark)

    van Bakel, Marian; Gerritsen, Marinel; van Oudenhoven, Jan Pieter

    Establishing contact between expatriates and a local host has been found to reap benefits with regard to Interaction Adjustment, Host National Social Support, Open-mindedness, and Social Initiative. This longitudinal study examines the role of the quality of contact for these four aspects....... Expatriates in the Netherlands were randomly divided into an experimental group (n = 33) of which 21 developed high-quality contact with their host, and a control group (n = 32) without host. The results show that contact quality plays an important role and suggest that the higher the quality of the contact......, the more benefit the expatriate experienced. Moreover, expatriates with low-quality contact did not experience a detrimental effect....

  17. New technologies for UV detectors

    Science.gov (United States)

    Joseph, C. L.

    1993-01-01

    Several technologies are currently being developed, leading to substantial improvements in the performance of UV detectors or significant reductions in power or weight. Four technologies discussed are (1) thin-film coatings to enhance the UV sensitivity of CCD's, (2) highly innovative magnet assemblies that dramatically reduce weight and result in virtually no external flux, (3) new techniques for curving microchannel plates (MCP's) so that single plates can be used to prevent ion feedback and present highly localized charge clouds to an anode structure, and (4) high-performance alternatives to glass-based MCP's. In item (2), for example, very robust magnets are made out of rare earth materials such as samarium cobalt, and cladding magnets are employed to prevent flux from escaping from the detector into the external environment. These new ultralight magnet assemblies are able to create strong, exceptionally uniform magnetic fields for image intensification and focusing of photoelectrons. The principle advantage of such detectors is the quantum efficiencies of 70-80 percent obtained throughout ultraviolet wavelengths (900-2000 A), the highest of any device. Despite the improvements achieved under item (3), high-performance alternatives to conventional glass-based MCP's potentially offer three distinct new advantages that include (1) a 30-100-fold improvement in dynamic range resulting in correspondingly higher signal-to-noise ratios, (2) the use of pure dielectric and semiconductor materials that will not outgas contaminants that eventually destroy photocathodes, and (3) channels that have constant spacing providing long-ranged order since the plates are made using photolithography techniques from the semiconductor industry. The manufacturers of these advanced-technology MCP's, however, are a couple of years away from actually producing a functioning image intensifier. In contrast to the use of CCD's for optical, ground based observations, there is no single

  18. Contact Lens Related Corneal Ulcer

    OpenAIRE

    Loh, KY; Agarwal, P

    2010-01-01

    A corneal ulcer caused by infection is one of the major causes of blindness worldwide. One of the recent health concerns is the increasing incidence of corneal ulcers associated with contact lens user especially if the users fail to follow specific instruction in using their contact lenses. Risk factors associated with increased risk of contact lens related corneal ulcers are: overnight wear, long duration of continuous wear, lower socio-economic classes, smoking, dry eye and poor hygiene. Th...

  19. Emotional Satisfaction of Customer Contacts

    OpenAIRE

    Güngör, Hüseyin

    2007-01-01

    For marketing and customer services researchers and professionals who are interested in customer contacts, customer satisfaction and loyalty issues. Contact centers are playing a pivotal role in customer services of the 21st century. Nevertheless, despite their growing importance and presence, contact centers are increasingly becoming the center for customer frustration, and frequently associated with negative comments in the media. Therefore, this research explores the Emotional, Cognitive, ...

  20. Non-contact ultrasound techniques

    International Nuclear Information System (INIS)

    Khazali Mohd Zin

    2001-01-01

    Non-contact ultrasound plays significant role in material characterisation and inspection. Unlike conventional ultrasonic techniques, non-contact ultrasonic is mostly applicable to areas where the former has its weaknesses and limitations. It is interesting to note that the non-contact ultrasonic technique has an important significant application in industry. The technique is signified by the fact that the object to be inspected is further away from the ultrasonic source, no couplant is needed and inconsistent pressure between the transducer and the specimen can be eliminated. The paper discusses some of the non-contact ultrasound technique and its applications. (Author)

  1. Occupational contact dermatitis in hairdressers

    DEFF Research Database (Denmark)

    Schwensen, Jakob F; Johansen, Jeanne Duus; Veien, Niels K

    2013-01-01

    BACKGROUND: Occupational contact dermatitis among hairdressers is frequent, owing to daily exposure to irritants and allergens. OBJECTIVES: To identify sensitization to the most common allergens associated with the occupation of hairdressing. METHODS: Patch test results of 399 hairdressers and 1995...... matched controls with contact dermatitis, registered by the Danish Contact Dermatitis Group between January 2002 and December 2011, were analysed. All patients were patch tested with the European baseline series, and hairdressers were additionally tested with the hairdressing series. RESULTS: Occupational...... contact dermatitis (p dermatitis was less commonly observed among hairdressers (21.3%) than among controls (29.4%) (p 

  2. UV-extending Ghost Inflation

    CERN Document Server

    Ivanov, Mikhail M

    2014-01-01

    We present a setup that provides a partial UV-completion of the ghost inflation model up to a scale which can be almost as high as the Planck mass. This is achieved by coupling the inflaton to the Lorentz-violating sector described by the Einstein-aether theory or its khronometric version. Compared to previous works on ghost inflation our setup allows to go beyond the study of small perturbations and include the background dynamics in a unified framework. In the specific regime when the expansion of the Universe is dominated by the kinetic energy of the inflaton we find that the model predicts rather high tensor-to-scalar ratio r ~ 0.02 $\\div$ 0.2 and non-Gaussianity of equilateral type with f_NL in the range from -50 to -5.

  3. Expression of UV-irradiated adenovirus in normal and UV-sensitive Chinese hamster ovary cells

    International Nuclear Information System (INIS)

    Rainbow, A.J.

    1985-01-01

    The chinese hamster ovary (CHO) cell mutants UV-20, UV-24, and UV-41 are abnormally sensitive to UV and harbour various defects lin their ability to repair cellular DNA. This study has examined the expression of UV-irradiated AD2 in these cells. HCR of UV-irradiated Ad2, as measured by viral structural antigen (Vag) formation or progeny production, was found to be similar for the normal and the UV-sensitive CHO strains. UV-irradiation of Ad2 (1200 J/m/sup 2/) resulted in a delay of Vag expression of 18 hours in normal human fibroblasts, which is thought to reflect the time required for removal of UV-induced lesions from the DNA before viral DNA synthesis can proceed. However, a similar UV-irradiation of Ad2 did not result in a delay of Vag expression for infection of CHO cells, suggesting that UV-induced lesions in Ad2 DNA do not inhibit its replication in CHO cells. These results indicate a fundamental difference in the processing of UV-irradiated AD2-DNA in CHO as compared to human cells

  4. Exposure to solar UV in Finland

    Energy Technology Data Exchange (ETDEWEB)

    Jokela, K; Leszczynski, K; Visuri, R; Ylianttila, L [Finnish Centre for Radiation and Nuclear Safety, Helsinki (Finland)

    1996-12-31

    Exceptionally low total ozone, up to 40 % below the normal level, was measured over Northern Europe during winter and spring in 1992 and 1993. In 1993 the depletion persisted up to the end of May, resulting in a significant increase in biologically effective ultraviolet (UV) radiation. The increases were significantly smaller in 1992 and 1994 than in 1993. A special interest in Northern Europe is the effect of high reflection of UV from the snow. The period from the mid March to the mid May is critical in Northern Finland, because in that time the UV radiation is intense enough to cause significant biological effects, and the UV enhancing snow still covers the ground. Moreover, there is some evidence of increasing springtime depletions of ozone over Arctic regions. In this study the increase of UV exposure associated with the ozone depletions was examined with measurements and theoretical calculations. The measurements were carried out with spectroradiometrically calibrated Solar Light Model 500 and 501 UV radiometers which measure the erythemally effective UV doses and dose rates. The theoretical UV doses and dose rates were computed with the clear sky model of Green

  5. UV dichroic coatings on metallic reflectors

    International Nuclear Information System (INIS)

    Raghunath, C; Babu, N J; Chandran, K M

    2008-01-01

    The work presented here explains the design and deposition process of dichroic coating on metallic reflectors developed for UV curing systems. Special designs are adopted to achieve the spectral band and optimized to suit to the requirements. A mirror, which reflects the UV radiation (220 - 400 nm) and absorbs visible and infrared radiation (400 - 2000nm), is described in detail

  6. UV dichroic coatings on metallic reflectors

    Energy Technology Data Exchange (ETDEWEB)

    Raghunath, C; Babu, N J; Chandran, K M [Hind High Vacuum Co. Pvt. Ltd. No.17, Phase 1, Peenya Industrial Area, Bangalore 560058 (India)

    2008-05-01

    The work presented here explains the design and deposition process of dichroic coating on metallic reflectors developed for UV curing systems. Special designs are adopted to achieve the spectral band and optimized to suit to the requirements. A mirror, which reflects the UV radiation (220 - 400 nm) and absorbs visible and infrared radiation (400 - 2000nm), is described in detail.

  7. UV Bandpass Optical Filter for Microspectometers

    NARCIS (Netherlands)

    Correia, J.H.; Emadi, A.R.; Wolffenbuttel, R.F.

    2006-01-01

    This paper describes the design and modeling of a UV bandpass optical filter for microspectrometers. The materials used for fabricating the multilayer UV filter are: silicon dioxide (SiO2), titanium dioxide (TiO2) and yttrium oxide (Y2O3). The optical filter shows a bandpass response wavelength in

  8. Ultraviolet (UV) Disinfection for Drinking Water Systems

    Science.gov (United States)

    UV disinfection is an effective process for inactivating many microbial pathogens in water with potential to serve as stand-alone treatment or in combination with other disinfectants. USEPA provided guidance on the validation of UV reactors nearly a decade ago. Since then, lesson...

  9. Discontinuities during UV writing of waveguides

    DEFF Research Database (Denmark)

    Svalgaard, Mikael; Harpøth, Anders; Andersen, Marc

    2005-01-01

    UV writing of waveguides can be hampered by discontinuities where the index change process suddenly shuts down. We show that thermal effects may account for this behaviour.......UV writing of waveguides can be hampered by discontinuities where the index change process suddenly shuts down. We show that thermal effects may account for this behaviour....

  10. Direct UV-writing of waveguides

    DEFF Research Database (Denmark)

    Færch, Kjartan Ullitz

    2003-01-01

    induced refractive index change of more than 10-2 have been obtained. New insight, with respect to understanding the UV induced index change obtained by direct UV writing, has been provided, through experiments conducted with such high-pressure loaded germanosilica samples. This include measurements...

  11. Effect of UV laser irradiation on tissue

    International Nuclear Information System (INIS)

    Nakayama, Takeyoshi; Kubo, Uichi

    1992-01-01

    Laser-tissue interactions have been investigated through Electron Probe Micro Analysis (EPMA), UV-visible optical absorption and Fourier Transform Infrared Spectroscopy (FTIR). Three excimer lasers, ArF, KrF and XeCl, were used to irradiate tissue; cow thighbone and gelatin thin film. Features of UV laser irradiation are described. (author)

  12. uv photobiology: DNA damage and repair

    International Nuclear Information System (INIS)

    Sutherland, B.M.

    1978-01-01

    The following topics are discussed: targets that determine the fate of the cell when uv light interacts with a cell; comparison of action spectrum for a given biological effect with the absorption spectrum of different biological macromolecules; biological effects of damage to DNA; measurement of mutations; chemical damage to DNA; photoreactivation; role of pyrimidine dimers in induction of skin cancer by uv

  13. Exposure to solar UV in Finland

    Energy Technology Data Exchange (ETDEWEB)

    Jokela, K.; Leszczynski, K.; Visuri, R.; Ylianttila, L. [Finnish Centre for Radiation and Nuclear Safety, Helsinki (Finland)

    1995-12-31

    Exceptionally low total ozone, up to 40 % below the normal level, was measured over Northern Europe during winter and spring in 1992 and 1993. In 1993 the depletion persisted up to the end of May, resulting in a significant increase in biologically effective ultraviolet (UV) radiation. The increases were significantly smaller in 1992 and 1994 than in 1993. A special interest in Northern Europe is the effect of high reflection of UV from the snow. The period from the mid March to the mid May is critical in Northern Finland, because in that time the UV radiation is intense enough to cause significant biological effects, and the UV enhancing snow still covers the ground. Moreover, there is some evidence of increasing springtime depletions of ozone over Arctic regions. In this study the increase of UV exposure associated with the ozone depletions was examined with measurements and theoretical calculations. The measurements were carried out with spectroradiometrically calibrated Solar Light Model 500 and 501 UV radiometers which measure the erythemally effective UV doses and dose rates. The theoretical UV doses and dose rates were computed with the clear sky model of Green

  14. UV Reconstruction Algorithm And Diurnal Cycle Variability

    Science.gov (United States)

    Curylo, Aleksander; Litynska, Zenobia; Krzyscin, Janusz; Bogdanska, Barbara

    2009-03-01

    UV reconstruction is a method of estimation of surface UV with the use of available actinometrical and aerological measurements. UV reconstruction is necessary for the study of long-term UV change. A typical series of UV measurements is not longer than 15 years, which is too short for trend estimation. The essential problem in the reconstruction algorithm is the good parameterization of clouds. In our previous algorithm we used an empirical relation between Cloud Modification Factor (CMF) in global radiation and CMF in UV. The CMF is defined as the ratio between measured and modelled irradiances. Clear sky irradiance was calculated with a solar radiative transfer model. In the proposed algorithm, the time variability of global radiation during the diurnal cycle is used as an additional source of information. For elaborating an improved reconstruction algorithm relevant data from Legionowo [52.4 N, 21.0 E, 96 m a.s.l], Poland were collected with the following instruments: NILU-UV multi channel radiometer, Kipp&Zonen pyranometer, radiosonde profiles of ozone, humidity and temperature. The proposed algorithm has been used for reconstruction of UV at four Polish sites: Mikolajki, Kolobrzeg, Warszawa-Bielany and Zakopane since the early 1960s. Krzyscin's reconstruction of total ozone has been used in the calculations.

  15. Fabricating customized hydrogel contact lens

    Science.gov (United States)

    Childs, Andre; Li, Hao; Lewittes, Daniella M.; Dong, Biqin; Liu, Wenzhong; Shu, Xiao; Sun, Cheng; Zhang, Hao F.

    2016-10-01

    Contact lenses are increasingly used in laboratories for in vivo animal retinal imaging and pre-clinical studies. The lens shapes often need modification to optimally fit corneas of individual test subjects. However, the choices from commercially available contact lenses are rather limited. Here, we report a flexible method to fabricate customized hydrogel contact lenses. We showed that the fabricated hydrogel is highly transparent, with refractive indices ranging from 1.42 to 1.45 in the spectra range from 400 nm to 800 nm. The Young’s modulus (1.47 MPa) and hydrophobicity (with a sessile drop contact angle of 40.5°) have also been characterized experimentally. Retinal imaging using optical coherence tomography in rats wearing our customized contact lenses has the quality comparable to the control case without the contact lens. Our method could significantly reduce the cost and the lead time for fabricating soft contact lenses with customized shapes, and benefit the laboratorial-used contact lenses in pre-clinical studies.

  16. Emotional Satisfaction of Customer Contacts

    NARCIS (Netherlands)

    Güngör, Hüseyin

    2007-01-01

    For marketing and customer services researchers and professionals who are interested in customer contacts, customer satisfaction and loyalty issues. Contact centers are playing a pivotal role in customer services of the 21st century. Nevertheless, despite their growing importance and presence,

  17. Journal of Business Research: Contact

    African Journals Online (AJOL)

    Principal Contact. Goski Alabi Mrs Institute of Professional Studies (IPS) P. 0 Box 149 Institute Of Professional Studies (IPS) Legon, Accra Ghana Phone: +233 24 64 52798. Fax: +233 21 513539. Email: goskia@yahoo.com. Support Contact. Anthony Afeadie. Phone: +233 21 500171. Email: ipsjournal@yahoo.com.

  18. Aluminum break-point contacts

    NARCIS (Netherlands)

    Heinemann, Martina; Groot, R.A. de

    1997-01-01

    Ab initio molecular dynamics is used to study the contribution of a single Al atom to an aluminum breakpoint contact during the final stages of breaking and the initial stages of the formation of such a contact. A hysteresis effect is found in excellent agreement with experiment and the form of the

  19. Contact Allergy to Neem Oil.

    NARCIS (Netherlands)

    de Groot, Anton; Jagtman, Berend A; Woutersen, Marjolijn

    2018-01-01

    A case of allergic contact dermatitis from neem oil is presented. Neem oil (synonyms: Melia azadirachta seed oil [INCI name], nim oil, margosa oil) is a vegetable (fixed) oil obtained from the seed of the neem tree Azadirachta indica by cold pressing. Contact allergy to neem oil has been described

  20. Body contact and body language

    DEFF Research Database (Denmark)

    Winther, Helle

    2008-01-01

    and the boundaries between self and world. In western societies, the modern premises for contact are in some ways developing from close contact to virtual communication. With this breadth of perspective in mind, the ques­tion is whether conscious and experimental work with body contact and body language in move......­ment psychology and education provide potential for intense personal develop­ment as well as for social and cultural learning processes. This performative research project originates from the research project entitled, Movement Psy­chol­ogy: The Language of the Body and the Psy­chol­ogy of Movement based......Body contact and body language are unique and existential and, although culturally dependent and socially embodied, they are also universal communication forms. For small children all over the world, warm, close and nourishing body contact is fundamental to their embodied experi­ence of themselves...

  1. UV-straling in de kas: mogelijkheden en grenzen

    NARCIS (Netherlands)

    Hoffmann, S.

    2000-01-01

    Effect van UV-straling op kleuring van Coleus Blumei 'Wizzard Velvit Red'. Gegevens in bijgaande tabellen: 1) Indeling optische straling; 2) Transmisse voor UV-straling van verschillende dekmaterialen (folie UV, glas UV, glas normaal, folie normaal, folie UV-blok

  2. Contact allergy to epoxy (meth)acrylates.

    Science.gov (United States)

    Aalto-Korte, Kristiina; Jungewelter, Soile; Henriks-Eckerman, Maj-Len; Kuuliala, Outi; Jolanki, Riitta

    2009-07-01

    Contact allergy to epoxy (meth)acrylates, 2,2-bis[4-(2-hydroxy-3-methacryloxypropoxy) phenyl]propane (bis-GMA), 2,2-bis[4-(2-hydroxy-3-acryloxypropoxy)phenyl]-propane (bis-GA), 2,2-bis[4-(methacryl-oxyethoxy)phenyl] propane (bis-EMA), 2,2-bis[4-(methacryloxy)phenyl]-propane (bis-MA), and glycidyl methacrylate (GMA) is often manifested together with contact allergy to diglycidyl ether of bisphenol A (DGEBA) epoxy resin. To analyse patterns of concomitant allergic reactions to the five epoxy (meth)acrylates in relation to exposure. We reviewed the 1994-2008 patch test files at the Finnish Institute of Occupational Health (FIOH) for reactions to the five epoxy (meth)acrylates, and examined the patients' medical records for exposure. Twenty-four patients had an allergic reaction to at least one of the studied epoxy (meth)acrylates, but specific exposure was found only in five patients: two bis-GMA allergies from dental products, two bis-GA allergies from UV-curable printing inks, and one bis-GA allergy from an anaerobic glue. Only 25% of the patients were negative to DGEBA epoxy resin. The great majority of allergic patch test reactions to bis-GMA, bis-GA, GMA and bis-EMA were not associated with specific exposure, and cross-allergy to DGEBA epoxy resin remained a probable explanation. However, independent reactions to bis-GA indicated specific exposure. Anaerobic sealants may induce sensitization not only to aliphatic (meth)acrylates but also to aromatic bis-GA.

  3. Ultraviolet radiation exposure from UV-transilluminators.

    Science.gov (United States)

    Akbar-Khanzadeh, Farhang; Jahangir-Blourchian, Mahdi

    2005-10-01

    UV-transilluminators use ultraviolet radiation (UVR) to visualize proteins, DNA, RNA, and their precursors in a gel electrophoresis procedure. This study was initiated to evaluate workers' exposure to UVR during their use of UV-transilluminators. The levels of irradiance of UV-A, UV-B, and UV-C were determined for 29 UV-transilluminators at arbitrary measuring locations of 6, 25, 62, and 125 cm from the center of the UV-transilluminator's filter surface in the direction of the operator's head. The operators (faculty, research staff, and graduate students) worked within 62 cm of the transilluminators, with most subjects commonly working at time ranged from 1 to 60 min. Actinic hazard (effective irradiance level of UVR) was also determined for three representative UV-transilluminators at arbitrary measuring locations of 2.5, 5, 10, 15, 20, 30, 40, and 50 cm from these sets' filter surface in the direction of the operator's head. The allowable exposure time for these instruments was less than 20 sec within 15 cm, less than 35 sec within 25 cm, and less than 2 min within 50 cm from the UV-transilluminators' filter surface. The results of this study suggest that the use of UV-transilluminators exposes operators to levels of UVR in excess of exposure guidelines. It is recommended that special safety training be provided for the affected employees and that exposure should be controlled by one or the combination of automation, substitution, isolation, posted warning signs, shielding, and/or personal protective equipment.

  4. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  5. Plant responses to UV-B irradiation are modified by UV-A irradiation

    International Nuclear Information System (INIS)

    Middleton, E.M.; Teramura, A.H.

    1993-01-01

    The increasing UV-B radiation (0.28-0.32 μm) reaching the earth's surface is an important concern. Plant response in artificial UV-B irradiation studies has been difficult to assess, especially regarding photosynthetic pigments, because the fluorescent lamps also produce UV-A (0.32-0.40μm) radiation which is involved with blue light in pigment synthesis. Both UV-A and UV-B irradiances were controlled in two glasshouse experiments conducted under relatively high PPFD (> 1300μmol m -2 s -1 ) at two biologically effective daily UV-B irradiances (10.7 and 14.1 kJ m -2 ); UV-A irradiances were matched in Controls (∼5, 9 kJ m -2 ). Normal, chlorophyll-deficient, and flavonoid-deficient isolines of soybean cultivar, Clark, were utilized. Many growth/ pigment variables exhibited a statistically significant interaction between light quality and quantity: in general, UV-A radiation moderated the damaging effects of UV-B radiation. Regression analyses demonstrated that a single negative function related photosynthetic efficiency to carotenoid Content (r 2 =0.73, P≤0.001), implying a open-quotes costclose quotes in maintaining carotenoids for photoprotection. A stomatal limitation to photosynthesis was verified and carotenoid content was correlated with UV-B absorbing compound levels, in UV-B irradiated plants

  6. Surface contamination to UV-curable acrylates in the furniture and parquet industry.

    Science.gov (United States)

    Surakka, J; Lindh, T; Rosén, G; Fischer, T

    2001-03-01

    Surface contamination to ultraviolet radiation curable coatings (UV coatings), used increasingly in the parquet and furniture industry, is a matter of concern as a source for skin contamination. UV coatings contain chemically and biologically reactive acrylates, well known as skin contact irritants and sensitizers. Surface contamination may spread secondarily to equipment and other unexpected areas even outside the workplace. Yet, studies concerning this type of contamination are lacking due to lack of suitable sampling methods. Surface contamination of the work environment with risk for skin exposure to UV coating was measured employing a quantitative adhesive tape sampling method developed for this purpose. A pilot study was first performed at three workplaces to evaluate the contamination. In the main study, we wanted to locate and identify in detail the surface contamination of areas where problems exist, and to determine the extent of the problem. Measurements were performed at seven workplaces on two separate workdays (round 1 and 2) within a six-month period. Samples were collected from the workplaces based on the video monitoring of skin contact frequency with the surfaces and categorized into three groups to analyze risk. The pilot study indicated that surface contamination to TPGDA containing UV coatings was common, found in 76 percent of the surfaces, and varied with a maximum of 909 microg TPGDA 10 cm(-2) sampling area. In the main study TPGDA was found in 153 out of 196 collected samples (78.1%); for round one 78.1 percent (82 out of 105 samples) and for round two 78.0 percent (71 out of 91 samples). The average TPGDA mass on positive surface samples was on the first round 2,247 +/- 7,462 microg, and on the second round 2,960 +/- 4,590 microg. We conclude that surface contamination to uncured UV coatings at UV-curing lines is common and this involves a risk for harmful, unintentional skin exposure to acrylates.

  7. Modeling the natural UV irradiation and comparative UV measurements at Moussala BEO (BG)

    Science.gov (United States)

    Tyutyundzhiev, N.; Angelov, Ch; Lovchinov, K.; Nitchev, Hr; Petrov, M.; Arsov, T.

    2018-03-01

    Studies of and modeling the impact of natural UV irradiation on the human population are of significant importance for human activity and economics. The sharp increase of environmental problems – extraordinary temperature changes, solar irradiation abnormalities, icy rains – raises the question of developing novel means of assessing and predicting potential UV effects. In this paper, we discuss new UV irradiation modeling based on recent real-time measurements at Moussala Basic Environmental Observatory (BEO) on Moussala Peak (2925 m ASL) in Rila Mountain, Bulgaria, and highlight the development and initial validation of portable embedded devices for UV-A, UV-B monitoring using open-source software architecture, narrow bandpass UV sensors, and the popular Arduino controllers. Despite the high temporal resolution of the VIS and UV irradiation measurements, the results obtained reveal the need of new assumptions in order to minimize the discrepancy with available databases.

  8. Light trapping with plasmonic back contacts in thin-film silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Paetzold, Ulrich Wilhelm

    2013-02-08

    small potential for increasing the reflection at the back contact with dielectric interlayers of even lower refractive index, such as SiO{sub 2} and air, is demonstrated. The light-trapping effect of two types of plasmonic back contacts, which make use of large and efficiently scattering Ag nanostructures, is studied in thin-film silicon solar cell prototypes. The first type of plasmonic back contact applies non-ordered Ag nanostructures. The preparation, characterization and three-dimensional electromagnetic simulations of these back contacts with various distributions of non-ordered Ag nanostructures are presented. Measured reflectance spectra of the Ag back contacts with non-ordered nanostructures are correlated with reflectance spectra derived from three-dimensional electromagnetic simulations of isolated nanostructures on Ag back contacts. A microcrystalline silicon solar cell fabricated on one type of plasmonic Ag back contact with non-ordered Ag nanostructures shows a significantly enhanced plasmonic light trapping when compared with a flat solar cell. The second type of plasmonic back contact applies periodic arrangements of plasmonic Ag nanostructures in a square lattice at the surface of the Ag back contact. It is called a plasmonic reflection grating back contact. A particular advantage of this device is the control of the scattering angles via the diffraction orders of the grating while taking advantage of the efficient plasmon-induced light scattering at the Ag nanostructures. The plasmonic reflection grating back contacts are prepared with a nanoimprint process. The prototype microcrystalline silicon solar cells exhibit a very good light-trapping effect. Even in comparison with solar cells with a state-of-the-art random texture for light trapping, an enhanced light-trapping effect is demonstrated for a solar sell with a plasmonic reflection grating of optimized period. Based on electromagnetic simulations, the light-trapping effect is explained from the

  9. Robust superhydrophobic tungsten oxide coatings with photochromism and UV durability properties

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Ting [Hubei Collaborative Innovation Centre for Advanced Organic Chemical Materials and Ministry-of-Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, 430062 (China); State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730000 (China); Guo, Zhiguang, E-mail: zguo@licp.cas.cn [Hubei Collaborative Innovation Centre for Advanced Organic Chemical Materials and Ministry-of-Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, 430062 (China); State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730000 (China)

    2016-11-30

    Highlights: • Superhydrophobic tungsten oxide (TO) coatings with a water contact angle (WCA) of 155° and rolling angle of 3.5° were developed. • The superhydrophobic coatings have excellent mechanical robustness and UV durability. • The superhydrophobic TO coatings show the reversible convert of photochromism. • The coating exhibited excellent self-cleaning behavior due to its high WCA and low rolling angle. - Abstract: Robust superhydrophobic tungsten oxide (TO) coatings with a water contact angle (WCA) of 155° were developed for photochromism via a facile and substrate-independent route. Importantly, after scatch test on both a single and two orthogonal direction, the TO coating still exhibited superhydrophobic behavior, indicating excellent mechanical robustness. It is worth mentioning that the superhydrophobic TO coatings showed the reversible convert of photochromism of WO{sub 3} induced by alternating UV and visible light irradiation. Besides that, the TO coating remained superhydrophobicity after UV irradiation for 36 h, showing excellent UV durability. In addition, the coating showed good resistance to acidic droplets. Moreover, it can also be applied on other substrates, such as copper mesh, steel, paper and fiber. The coating exhibited excellent self-cleaning behavior due to its high WCA and low rolling angle. Overall, this work is a promising approach to design and produce functional superhydrophobic coatings for various substrates.

  10. Radioactive decontamination through UV laser

    International Nuclear Information System (INIS)

    Delaporte, Ph.; Gastaud, M.; Sentis, M.; Uteza, O.; Marine, W.; Thouvenot, P.; Alcaraz, J.L.; Le Samedy, J.M.; Blin, D.

    2003-01-01

    A device allowing the radioactive decontamination of metal surfaces through the use of a pulsed UV laser has been designed and tested. This device is composed of a 1 kW excimer laser linked to a bundle of optic fibers and of a system to recover particles and can operate in active zones. Metal surfaces have the peculiarities to trap radio-elements in a superficial layer of oxide that can be eaten away by laser radiation. Different contaminated metals (stainless steels, INCONEL and aluminium) issued from the nuclear industry have been used for the testing. The most important contaminants were 60 Co, 137 Cs, 154-155 Eu and 125 Sb. The ratio of decontamination was generally of 10 and the volume of secondary wastes generating during the process was very low compared with other decontamination techniques. A decontamination speed of 1 m 2 /h has been reached for aluminium. The state of the surface is an important parameter because radio-elements trapped in micro-cracks are very difficult to remove. (A.C.)

  11. Superhydrophobic durable coating based on UV-photoreactive silica nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Nahum, T.; Dodiuk, H.; Dotan, A.; Kenig, S. [Department of Plastics Engineering, Shenkar College of Engineering and Design, 12 Anna Frank Street, Ramat Gan 52526 (Israel); Lellouche, J. P. [Department of Chemistry, Nanomaterials Research Center, Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramar-Gan, 52900 (Israel)

    2015-05-22

    Superhydrophobic surfaces with contact angle (CA) >150 and sliding angle (SA) <10 have been aroused curiosity over the years due to their various applications. Superhydrophobicity can be obtained tailoring the chemistry and the roughness of the surface, mimicking the Lotus flower. Most superhydrophobic surfaces based on secondary bonding lose their roughness in harsh conditions and are unsuitable for practical applications. Photoreactive SiO{sub 2} nanoparticles (NPs) based on benzophenone (BP) can be a very effective tool for formation of reactive species that function as a molecular bridge by covalent bonding between the NP and any polymer matrix with C-C and C-H bonds. The present work focused on thermoset radiation curing urethane acrylate. Upon UV irradiation reactive excited nπ* triplet benzophenone species are formed and react through hydrogen abstraction to form ketyl radicals which interact with a radicals from the UV irradiated polymer matrix to yield covalent bonding. Roughness was achieved by dipping the substrate in SiO{sub 2}@BPs NPs dispersion followed by irradiation. Fluoroalkylsilane was used to obtain hydrophobic top layer. AFM nano manipulation was used to verify the immobilization of NPs. Evaluation of durability was made using air flow at 300 km/hr. Preliminary results indicate the formation of super hydrophobic surfaces (CA>150 and SA<10) with improved stability.

  12. Superhydrophobic durable coating based on UV-photoreactive silica nanoparticles

    International Nuclear Information System (INIS)

    Nahum, T.; Dodiuk, H.; Dotan, A.; Kenig, S.; Lellouche, J. P.

    2015-01-01

    Superhydrophobic surfaces with contact angle (CA) >150 and sliding angle (SA) <10 have been aroused curiosity over the years due to their various applications. Superhydrophobicity can be obtained tailoring the chemistry and the roughness of the surface, mimicking the Lotus flower. Most superhydrophobic surfaces based on secondary bonding lose their roughness in harsh conditions and are unsuitable for practical applications. Photoreactive SiO 2 nanoparticles (NPs) based on benzophenone (BP) can be a very effective tool for formation of reactive species that function as a molecular bridge by covalent bonding between the NP and any polymer matrix with C-C and C-H bonds. The present work focused on thermoset radiation curing urethane acrylate. Upon UV irradiation reactive excited nπ* triplet benzophenone species are formed and react through hydrogen abstraction to form ketyl radicals which interact with a radicals from the UV irradiated polymer matrix to yield covalent bonding. Roughness was achieved by dipping the substrate in SiO 2 @BPs NPs dispersion followed by irradiation. Fluoroalkylsilane was used to obtain hydrophobic top layer. AFM nano manipulation was used to verify the immobilization of NPs. Evaluation of durability was made using air flow at 300 km/hr. Preliminary results indicate the formation of super hydrophobic surfaces (CA>150 and SA<10) with improved stability

  13. Development Of Hyper branched UV Curable Resin From Palm Oil

    International Nuclear Information System (INIS)

    Mek Zah Salleh; Mohamad Lokman Latif; Rida Tajau; Nik Ghazali Nik Salleh; Mohd Sofian Alias

    2014-01-01

    The hyper branched polyurethane acrylate (HBPUA) was prepared by reacting hyper branched polyol polyester (HBP) from palm oil based with diisocyanate and hydroxyl-containing acrylate monomer with the presence of 0.1-2 wt % dibutyltin dilaurate as a catalyst. The reaction was confirmed by several analyses for example determination of hydroxyl value (OHV), acid value (AV), Fourier transform infrared (FTIR) spectroscopy, gel permeation chromatography (GPC) and nuclear magnetic resonance (NMR) spectroscopy analyses. HBPUA required 0.36 J/ cm 2 energy when undergone curing with UV radiation. HBPUA / TMPTA films showed 4B-2H of pencil hardness, gel content of 60-80 %, contact angle θ between 65-74 degree and T g at -15 to -5 degree Celsius. The presence of TMPTA increased degree of cross-linking and pencil hardness. The characteristic of the polymeric material and the thermal stability of UV cured films of HBPUA formulations were determined by differential scanning calorimetry (DSC) and thermogravimetric analyzer (TGA). The thermal decomposition temperature started at 200 degree Celsius with T max at 450 to 455 degree Celsius. (author)

  14. Application of UV Imaging in Formulation Development

    DEFF Research Database (Denmark)

    Sun, Yu; Østergaard, Jesper

    2017-01-01

    defining formulation behavior after exposure to the aqueous environments and pharmaceutical performance is critical in pharmaceutical development, manufacturing and quality control of drugs. UV imaging has been explored as a tool for qualitative and quantitative characterization of drug dissolution...... related to the structural properties of the drug substance or formulation can be monitored. UV imaging is a non-intrusive and simple-to-operate analytical technique which holds potential for providing a mechanistic foundation for formulation development. This review aims to cover applications of UV...

  15. Global Solar UV Index (invited paper)

    International Nuclear Information System (INIS)

    Repacholi, M.H.

    2000-01-01

    Excessive solar ultraviolet (UV) radiation exposure produces a significant burden of disease to the skin, eyes and immune system. Effective programmes for the reduction of UV exposure are needed to reduce this disease burden and the associated health care costs. The UV index is seen as an effective tool for communicating important protection information to the public through its use in media news and weather information. The index is described and it is suggested that universally common messages should be associated with its ranges. (author)

  16. RPC industries - UV and EB equipment manufacturers

    International Nuclear Information System (INIS)

    Rodrigues, A.M.

    1987-01-01

    RPC Industries has been manufacturing electron beam and ultraviolet equipment for the industrial processing of materials for more than 15 years. RPC maintains its headquarters and electron processor manufacturing plant in Hayward, California. UV equipment is made in the company's plant near Chicago. Sales offices are maintained in New York, Illinois, and California in the USA, and in Germany, Japan, Australia, Italy, Israel, and Sweden. Complete testing and pilot facilities are available in Hayward (EB) and near Chicago (UV). Described below are the basic system components, applications and advantages of RPC's UV and EB systems. (orig.)

  17. Transformation of UV-hypersensitive Chinese hamster ovary cell mutants with UV-irradiated plasmids

    International Nuclear Information System (INIS)

    Nairn, R.S.; Humphrey, R.M.; Adair, G.M.

    1988-01-01

    Transfection of UV-hypersensitive, DNA repair-deficient Chinese hamster ovary (CHO) cell lines and parental, repair-proficient CHO cells with UV-irradiated pHaprt-1 or pSV2gpt plasmids resulted in different responses by recipient cell lines to UV damage in transfected DNA. Unlike results reported for human cells, UV irradiation of transfecting DNA did not stimulate genetic transformation of CHO recipient cells. In repair-deficient CHO cells, proportionally fewer transformants were produced with increasing UV damage than in repair-proficient cells in transfections with UV-irradiated hamster adenine phosphoribosyltransferase (APRT) gene contained in plasmid pHaprt-1. Transfection of CHO cells with UV-irradiated pSV2gpt resulted in neither decline in transformation frequencies in repair-deficient cell lines relative to repair-proficient cells nor stimulation of genetic transformation by UV damage in the plasmid. Blot hybridization analysis of DNA samples isolated from transformed cells showed no dramatic changes in copy number or arrangement of transfected plasmid DNA with increasing UV dose. The authors conclude responses of recipient cells to UV-damaged transfecting plasmids depend on type of recipient cell and characteristics of the genetic sequence used for transfection. (author)

  18. Nordic project food contact materials

    DEFF Research Database (Denmark)

    Li, Ågot; Tesdal Håland, Julie; Petersen, Jens Højslev

    Denmark, Finland, Faroe Islands, Iceland, Norway and Sweden have in 2013––2015 conducted a Nordic project on food contact materials. Food contact materials are used in all stages of food production and can be a general source of contamination. The food safety authorities in most of the Nordic...... countries have had a limited focus on the FCM area with the exception of Denmark and Finland. The aim of the project was therefore to control establishments producing, importing or using plastic food contact materials as well as to increase the knowledge of the inspectors performing these controls....... The focus of the inspections was to control the declaration of compliance (DoC) for plastic food contact materials. The requirement for a Doc is mandatory in order to ensure that the FCM complies with the legislation. In addition some products were analyzed for phthalates....

  19. Scalable algorithms for contact problems

    CERN Document Server

    Dostál, Zdeněk; Sadowská, Marie; Vondrák, Vít

    2016-01-01

    This book presents a comprehensive and self-contained treatment of the authors’ newly developed scalable algorithms for the solutions of multibody contact problems of linear elasticity. The brand new feature of these algorithms is theoretically supported numerical scalability and parallel scalability demonstrated on problems discretized by billions of degrees of freedom. The theory supports solving multibody frictionless contact problems, contact problems with possibly orthotropic Tresca’s friction, and transient contact problems. It covers BEM discretization, jumping coefficients, floating bodies, mortar non-penetration conditions, etc. The exposition is divided into four parts, the first of which reviews appropriate facets of linear algebra, optimization, and analysis. The most important algorithms and optimality results are presented in the third part of the volume. The presentation is complete, including continuous formulation, discretization, decomposition, optimality results, and numerical experimen...

  20. Research in Hospitality Management: Contact

    African Journals Online (AJOL)

    Principal Contact. Dr Sjoerd A Gehrels Editor-in-Chief Stenden Hotel Management School, Academy of International Hospitality Research, Leeuwarden, The Netherlands Email: sjoerd.gehrels@stenden.com ...

  1. EPA Alternative Dispute Resolution Contacts

    Science.gov (United States)

    The success of EPA's ADR efforts depends on a network of talented and experienced professionals in Headquarters offices and EPA Regions. For Agency-wide ADR information, please contact the Conflict Prevention and Resolution Center.

  2. Femtosecond UV-laser pulses to unveil protein-protein interactions in living cells.

    Science.gov (United States)

    Itri, Francesco; Monti, Daria M; Della Ventura, Bartolomeo; Vinciguerra, Roberto; Chino, Marco; Gesuele, Felice; Lombardi, Angelina; Velotta, Raffaele; Altucci, Carlo; Birolo, Leila; Piccoli, Renata; Arciello, Angela

    2016-02-01

    A hallmark to decipher bioprocesses is to characterize protein-protein interactions in living cells. To do this, the development of innovative methodologies, which do not alter proteins and their natural environment, is particularly needed. Here, we report a method (LUCK, Laser UV Cross-linKing) to in vivo cross-link proteins by UV-laser irradiation of living cells. Upon irradiation of HeLa cells under controlled conditions, cross-linked products of glyceraldehyde-3-phosphate dehydrogenase (GAPDH) were detected, whose yield was found to be a linear function of the total irradiation energy. We demonstrated that stable dimers of GAPDH were formed through intersubunit cross-linking, as also observed when the pure protein was irradiated by UV-laser in vitro. We proposed a defined patch of aromatic residues located at the enzyme subunit interface as the cross-linking sites involved in dimer formation. Hence, by this technique, UV-laser is able to photofix protein surfaces that come in direct contact. Due to the ultra-short time scale of UV-laser-induced cross-linking, this technique could be extended to weld even transient protein interactions in their native context.

  3. Metal semiconductor contacts and devices

    CERN Document Server

    Cohen, Simon S; Einspruch, Norman G

    1986-01-01

    VLSI Electronics Microstructure Science, Volume 13: Metal-Semiconductor Contacts and Devices presents the physics, technology, and applications of metal-semiconductor barriers in digital integrated circuits. The emphasis is placed on the interplay among the theory, processing, and characterization techniques in the development of practical metal-semiconductor contacts and devices.This volume contains chapters that are devoted to the discussion of the physics of metal-semiconductor interfaces and its basic phenomena; fabrication procedures; and interface characterization techniques, particularl

  4. Embodied Archives as Contact Zones

    Directory of Open Access Journals (Sweden)

    Judit Vidiella

    2015-02-01

    Full Text Available This article proposes a reflection about affective politics from locating some theoretical and conceptual genealogies like «emotion», «affection», «zones of contact»…, that understand them as action and force fields. These contributions allow us to rethink the relation of affects with politics and strategies of archive linked to performance, and understood as zones of friction, collision, circulation and contact: performative writing, repertoire, memes…

  5. [Contact allergy to henna tattoos].

    Science.gov (United States)

    Steinkjer, Bjarte; Stangeland, Katarina Zak; Mikkelsen, Carsten Sauer

    2011-03-18

    Tattoos with henna colours have become very popular and the prevalence of contact allergy seems to increase. This is a short review article based on our own clinical experience and literature identified through a search in PubMed with the words "henna", "paraphenylendiamin" and "allergic contact dermatitis." A case report is included. It is well documented that many experience skin reactions after henna tattoos. The cause is almost always contact allergy to the azo compound paraphenylendiamin, which is added to speed up the process and make the colour darker. Most people, including children, get henna tattoos during vacations in Asia or the Mediterranean. Established contact allergy is permanent. Many hair-colour products contain paraphenylendiamin, and persons with contact allergy against the product may develop a very strong contact allergic eczema by use of such substances. Acute reactions are treated with local cortisone products, or with systemic steroids. Cross reaction to substances with a similar chemical structure may occur. Tattoos with paraphenylendiamin-containing henna colours should be avoided.

  6. Contact isotopic- and contact ion-exchange between two adsorbents

    International Nuclear Information System (INIS)

    Bunzl, K.; Mohan, R.; Haimerl, M.

    1975-01-01

    The kinetics of contact ion exchange processes between an ion exchange membrane and resin ion exchange beads, stirred in pure water, was investigated. A general criterion was derived, which indicates whether diffusion of the ions between the intermingling electric double layers or the collision frequency between the two adsorbents is the rate dermining step. Since the latter process proved to be rate controlling under our experimental conditions, the corresponding rate equations were derived under various initial and boundary conditions. Experimentally, the kinetics of contact isotopic exchange of Cs + - and Na + -ions as well as of the reverse contact ion exchange process of Cs + -versus Na + -ions were investigated by using Na 22 and Cs 137 radioisotopes. The experiments reveal in quantitative accord with the theory that the rate of collision controlled contact ion exchange processes depends mainly on the 'exchange coefficient', the separation factor and the collision frequency. While the latter two quantities were determined independently by separate experiments, the 'exchange coefficient' was evaluated from a contact isotopic exchange experiment. (orig.) [de

  7. New technology and application in UV curing

    International Nuclear Information System (INIS)

    Loutz, J.M.

    1999-01-01

    Overview of radcure technology was presented. Its included this following subjects, radiation curable powder coatings, UV curable water based polyurethanes, photo-initiators, fire retardancy, aqueous systems, cationic, ceramic and optical grade material

  8. Effect of UV irradiation on cutaneous cicatrices

    DEFF Research Database (Denmark)

    Due, Eva; Rossen, Kristian; Sorensen, Lars Tue

    2007-01-01

    The aim of this study was to examine the effect of ultraviolet (UV) irradiation on human cutaneous cicatrices. In this randomized, controlled study, dermal punch biopsy wounds served as a wound healing model. Wounds healed by primary or second intention and were randomized to postoperative solar UV...... postoperatively, UV-irradiated cicatrices healing by second intention: (i) were significantly pointed out as the most disfiguring; (ii) obtained significantly higher scores of colour, infiltration and cicatrix area; and (iii) showed significantly higher increase in skin-reflectance measurements of skin......-pigmentation vs. non-irradiated cicatrices. No histological, immunohistochemical or biochemical differences were found. In conclusion, postoperative UV exposure aggravates the clinical appearance of cicatrices in humans....

  9. UV curable palm oil based ink

    International Nuclear Information System (INIS)

    Mek Zah Salleh; Mohd Hilmi Mahmood; Khairul Zaman Mohd Dahlan; Rosley Che Ismail

    2002-01-01

    UV curable inks are useful for their instant drying, energy saving and high productivity properties. The basic materials for formulating UV curable inks consist of prepolymer, monomers, photoinitiators, pigments and other additives. The percentage composition and ingredients depend very much on the types of inks to be produced. Palm oil is one of the main raw materials available in the country. Hence, the diversification of palm oil derivatives into new products has been given priority. The current focus of the present work is to evaluate the use of palm oil urethane acrylate (POBUA) as a prepolymer in the UV ink system. A study was conducted on the use of POBUA with other materials in ink formulation. These include the types and concentration of photoinitiators, monomers and commercial urethane acrylates. The evaluation of the ink properties such as curing, adhesion, color density have been carried out. It was found that POBUA could be introduced in the UV ink system. (Author)

  10. UV curable palm oil based inks

    International Nuclear Information System (INIS)

    Mek Zah Salleh; Hilmi Mahmood

    2002-01-01

    UV curable inks are useful for their instant drying, energy saving and high productivity properties. The basic materials for formulating UV curable inks consist of prepolymer, monomers, photoinitiators, pigments and other additives. The percentage composition and ingredients depend very much on the types of inks to be produced. Palm oil is one of the main raw materials available in the country. Hence, the diversification of palm oil derivatives into new products has been given priority. The current focus of the present work is to evaluate the use of palm oil based urethane acrylate (POBUA) as a prepolymer in the UV inks system. A study was conducted on the use of POBUA with other materials in ink formulation. These include the types and concentration of photoinitiators, monomers and commercial urethane acrylates. The evaluation of the ink properties such as curing, adhesion, color density have been carried out. It was found that POBUA could be introduced in the UV ink system. (Author)

  11. Accelerated Solar-UV Test Chamber

    Science.gov (United States)

    Gupta, A.; Laue, E. G.

    1984-01-01

    Medium-pressure mercury-vapor lamps provide high ratio of ultraviolet to total power. Chamber for evaluating solar-ultraviolet (UV) radiation damage permits accelerated testing without overheating test specimens.

  12. UV filters for lighting of plants

    Energy Technology Data Exchange (ETDEWEB)

    Doehring, T.; Koefferlein, M.; Thiel, S.; Seidlitz, H.K.; Payer, H.D. [GSF-Forschungszentrum fuer Umwelt und Gesundheit GmbH, Oberschleissheim (Germany)

    1994-12-31

    Different filter glasses are available which provide absorption properties suitable for gradual changes of the spectral UV-B illumination of artificial lighting. Using a distinct set of lamps and filter glasses an acceptable simulation of the UV-B part of natural global radiation can be achieved. The ageing of these and other filter materials under the extreme UV radiation in the lamphouse of a solar simulator is presently unavoidable. This instability can be dealt with only by a precise spectral monitoring and by replacing the filters accordingly. For this reason attempts would be useful to develop real ozone filters which can replace glass filters. In any case chamber experiments require a careful selection of the filter material used and must be accompanied by a continuous UV-B monitoring.

  13. Road Signs for UV-Completion

    CERN Document Server

    Dvali, Gia; Gomez, Cesar

    2012-01-01

    We confront the concepts of Wilsonian UV-completion versus self-completion by Classicalization in theories with derivatively-coupled scalars. We observe that the information about the UV-completion road is encoded in the sign of the derivative terms. We note that the sign of the derivative couplings for which there is no consistent Wilsonian UV-completion is the one that allows for consistent classicalons. This is an indication that for such a sign the vertex must be treated as fundamental and the theory self-protects against potential inconsistencies, such as superluminality, via self-completion by classicalization. Applying this reasoning to the UV-completion of the Standard Model, we see that the information about the Higgs versus classicalization is encoded in the sign of the scattering amplitude of longitudinal W-bosons. Negative sign excludes Higgs or any other weakly-coupled Wilsonian physics.

  14. Mean Annual UV-B Irradiance

    Data.gov (United States)

    U.S. Environmental Protection Agency — Ultraviolet-B (UV-B) radiation is the most energetic part of sunlight reaching the Earth's surface (wavelength region is 280 to 315 nm), and it has been shown to...

  15. UV Impacts Avoided by the Montreal Protocol

    Science.gov (United States)

    Newman, Paul; McKenzie, Richard

    2010-01-01

    Temporal and geographical variabilities in the future "World Expected" UV environment are compared with the "World Avoided", which would have occurred without the Montreal Protocol on protection of the ozone layer and its subsequent amendments and adjustments. Based on calculations of clear-sky UV irradiances, the effects of the Montreal Protocol have been hugely beneficial to avoid the health risks, such as skin cancer, which are associated with high UV, while there is only a small increase in health risks, such as vitamin D deficiency, that are associated with low UV. However, interactions with climate change may lead to changes in cloud and albedo, and possibly behavioural changes which could also be important.

  16. Progress in deep-UV photoresists

    Indian Academy of Sciences (India)

    Unknown

    This paper reviews the recent development and challenges of deep-UV photoresists and their ... small amount of acid, when exposed to light by photo- chemical ... anomalous insoluble skin and linewidth shift when the. PEB was delayed.

  17. Remote UV Fluorescence Lifetime Spectrometer, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — The goal of this project is to develop, demonstrate, and deliver to NASA an innovative, portable, and power efficient Remote UV Fluorescence Lifetime Spectrometer...

  18. UV sensitivity of various solid state detectors

    International Nuclear Information System (INIS)

    Knezevic, Zeljka; Ranogajec-Komor, Maria; Miljanic, Saveta

    2008-01-01

    Full text: The light sensitivity is an important characteristic of solid state passive dosimeters used in individual, clinical and environmental dosimetry. Light sensitivity stands for the response directly induced by visible or UV light in a fully annealed material. For the above mentioned applications a negligible light sensitivity is an advantage. However, high light sensitivity and linear response allows the use of detectors as UV dosimeters. For this purpose various TL detectors and the glass element of the RPL dosemeter type SC-1 were systematically investigated after exposure to UV light (254 and 366 nm) as a function of time. The following solid state detectors were investigated relative to TLD-100: Li 2 B 4 O 7 :Cu,Ag,P LiF:Mg,Cu,P, LiF:Mg,Cu,Si, Al 2 O 3 :C and the glass element of RPL dosimeter. UV irradiations were performed with Camag UV lamp at 254 nm and at 366 nm. The illumination times were 5, 10 and 20 minutes. Day light illumination was also carried out at room temperature over time period of several hours up to 2 weeks. The UV light response of each detector was compared to the response obtained after irradiation with 137 Cs. Al 2 O 3 :C, showed high light sensitivity; after 10 minutes illumination with 254 nm UV light the response was equivalent to 130 mGy 137 Cs gamma irradiation. The 254 nm UV response of LiF:Mg,Cu,P (GR-200 A), as well as TLD-700H and Li 2 B 4 O 7 :Cu,Ag,P were proportional to the time of illumination. The responses after 10 min UV illumination were equivalent to 0.001 mGy, 0.01 mGy and 0.1 mGy 137 Cs gamma irradiation, respectively. The complete SC-1 RPL dosimeter is insensitive to light because the glass element is encapsulated in light protected holder throughout the automatic evaluation process following the annealing (irradiation, preheat, readout). The responses of the previously annealed glass element after 20 min illumination with 254 nm and 366 nm UV light were equivalent to 45μSv and 3 μSv of 137 Cs gamma

  19. Solar cell with back side contacts

    Science.gov (United States)

    Nielson, Gregory N; Okandan, Murat; Cruz-Campa, Jose Luis; Resnick, Paul J; Wanlass, Mark Woodbury; Clews, Peggy J

    2013-12-24

    A III-V solar cell is described herein that includes all back side contacts. Additionally, the positive and negative electrical contacts contact compoud semiconductor layers of the solar cell other than the absorbing layer of the solar cell. That is, the positive and negative electrical contacts contact passivating layers of the solar cell.

  20. Measuring The Contact Resistances Of Photovoltaic Cells

    Science.gov (United States)

    Burger, D. R.

    1985-01-01

    Simple method devised to measure contact resistances of photovoltaic solar cells. Method uses readily available equipment and applicable at any time during life of cell. Enables evaluation of cell contact resistance, contact-end resistance, contact resistivity, sheet resistivity, and sheet resistivity under contact.

  1. Dynamic Optimization of UV Flash Processes

    DEFF Research Database (Denmark)

    Ritschel, Tobias Kasper Skovborg; Capolei, Andrea; Jørgensen, John Bagterp

    2017-01-01

    UV ash processes, also referred to as isoenergetic-isochoric ash processes, occur for dynamic simulation and optimization of vapor-liquid equilibrium processes. Dynamic optimization and nonlinear model predictive control of distillation columns, certain two-phase ow problems, as well as oil reser...... that the optimization solver, the compiler, and high-performance linear algebra software are all important for e_cient dynamic optimization of UV ash processes....

  2. Bactericidal effectiveness of modulated UV light

    International Nuclear Information System (INIS)

    Bank, H.L.; John, J.; Schmehl, M.K.; Dratch, R.J.

    1990-01-01

    Studies were designed to evaluate the effectiveness of pulsed modulated UV light waveforms for killing bacteria. Exposure of five strains of bacteria to the modulated information encoded in the light decreased the colony population from a confluent lawn to less than 20 colonies. However, approximately 2,000 colonies survived treatment with the same intensity and time of exposure to UV light lacking the modulated information

  3. From ozone depletion to biological UV damage

    Energy Technology Data Exchange (ETDEWEB)

    Tamm, E; Thomalla, E; Koepke, P [Munich Univ. (Germany). Meteorological Inst.

    1996-12-31

    Based on the ozone data from the Meteorological Observatory Hohenpeissenberg (MOHP: 47.8 deg N, 11.01 deg E) and corresponding mean atmospheric conditions, high resolution UV spectra are calculated with a complex radiation transfer model STAR. Biologically weighted UV spectra are investigated as integrated irradiances (dose rates) for maximum zenith angles and as daily integrals for selected days of the year. Ozone variation and uncertainty of action spectra are investigated

  4. UV spectra, bombs, and the solar atmosphere

    OpenAIRE

    Judge, Philip G.

    2015-01-01

    A recent analysis of UV data from the Interface Region Imaging Spectrograph {\\em IRIS} reports plasma "bombs" with temperatures near \\hot{} within the solar photosphere. This is a curious result, firstly because most bomb plasma pressures $p$ (the largest reported case exceeds $10^3$ dyn~cm$^{-2}$) fall well below photospheric pressures ($> 7\\times10^3$), and secondly, UV radiation cannot easily escape from the photosphere. In the present paper the {\\em IRIS} data is independently analyzed. I...

  5. Chronic effects of UV on human skin

    International Nuclear Information System (INIS)

    Cesarini, J.P.

    1996-01-01

    Chronic exposures and acute accidents of the skin to UV has been recognized as an important risk for skin cancers in human. Attempts have been made with mathematical models to correlate the ambient UV dose and occupational irradiations with the risk of skin cancers. Development of accurate global measurements of solar irradiance and personal dosimetry is expected in the future in order to reduce the exposure of the general population, to precise the measures to be taken for indoor and outdoor workers. (author)

  6. UV written compact broadband optical couplers

    DEFF Research Database (Denmark)

    Olivero, Massimo; Svalgaard, Mikael

    2005-01-01

    In this paper the first demonstration of compact asymmetric directional couplers made by UV writing is presented. The combined performance in terms bandwidth, loss and compactness exceeds that reported using other, more elaborate fabrication techniques.......In this paper the first demonstration of compact asymmetric directional couplers made by UV writing is presented. The combined performance in terms bandwidth, loss and compactness exceeds that reported using other, more elaborate fabrication techniques....

  7. UV written 1x8 optical splitters

    DEFF Research Database (Denmark)

    Olivero, Massimo; Svalgaard, Mikael

    2005-01-01

    In this paper the first demonstration of 1x8 optical power splitters made by direct UV writing is presented. Design and optimization of the process as well as the performance of the fabricated components are discussed.......In this paper the first demonstration of 1x8 optical power splitters made by direct UV writing is presented. Design and optimization of the process as well as the performance of the fabricated components are discussed....

  8. Accurate modeling of UV written waveguide components

    DEFF Research Database (Denmark)

    Svalgaard, Mikael

    BPM simulation results of UV written waveguide components that are indistinguishable from measurements can be achieved on the basis of trajectory scan data and an equivalent step index profile that is very easy to measure.......BPM simulation results of UV written waveguide components that are indistinguishable from measurements can be achieved on the basis of trajectory scan data and an equivalent step index profile that is very easy to measure....

  9. Accurate modelling of UV written waveguide components

    DEFF Research Database (Denmark)

    Svalgaard, Mikael

    BPM simulation results of UV written waveguide components that are indistinguishable from measurements can be achieved on the basis of trajectory scan data and an equivalent step index profile that is very easy to measure.......BPM simulation results of UV written waveguide components that are indistinguishable from measurements can be achieved on the basis of trajectory scan data and an equivalent step index profile that is very easy to measure....

  10. From ozone depletion to biological UV damage

    Energy Technology Data Exchange (ETDEWEB)

    Tamm, E.; Thomalla, E.; Koepke, P. [Munich Univ. (Germany). Meteorological Inst.

    1995-12-31

    Based on the ozone data from the Meteorological Observatory Hohenpeissenberg (MOHP: 47.8 deg N, 11.01 deg E) and corresponding mean atmospheric conditions, high resolution UV spectra are calculated with a complex radiation transfer model STAR. Biologically weighted UV spectra are investigated as integrated irradiances (dose rates) for maximum zenith angles and as daily integrals for selected days of the year. Ozone variation and uncertainty of action spectra are investigated

  11. Inactivation of avirulent Yersinia pestis on food and food contact surfaces by ultraviolet light and freezing.

    Science.gov (United States)

    Sommers, Christopher H; Sheen, Shiowshuh

    2015-09-01

    Yersinia pestis, the causative agent of plague, can occasionally be contracted as a naso-pharyngeal or gastrointestinal illness through consumption of contaminated meat. In this study, the use of 254 nm ultraviolet light (UV-C) to inactivate a multi-isolate cocktail of avirulent Y. pestis on food and food contact surfaces was investigated. When a commercial UV-C conveyor was used (5 mW/cm(2)/s) 0.5 J/cm(2) inactivated >7 log of the Y. pestis cocktail on agar plates. At 0.5 J/cm(2), UV-C inactivated ca. 4 log of Y. pestis in beef, chicken, and catfish, exudates inoculated onto high density polypropylene or polyethylene, and stainless steel coupons, and >6 log was eliminated at 1 J/cm(2). Approximately 1 log was inactivated on chicken breast, beef steak, and catfish fillet surfaces at a UV-C dose of 1 J/cm(2). UV-C treatment prior to freezing of the foods did not increase the inactivation of Y. pestis over freezing alone. These results indicate that routine use of UV-C during food processing would provide workers and consumers some protection against Y. pestis. Published by Elsevier Ltd.

  12. Photodegradation and toxicity changes of antibiotics in UV and UV/H2O2 process

    International Nuclear Information System (INIS)

    Yuan Fang; Hu Chun; Hu Xuexiang; Wei Dongbin; Chen Yong; Qu Jiuhui

    2011-01-01

    The photodegradation of three antibiotics, oxytetracycline (OTC), doxycycline (DTC), and ciprofloxacin (CIP) in UV and UV/H 2 O 2 process was investigated with a low-pressure UV lamp system. Experiments were performed in buffered ultrapure water (UW), local surface water (SW), and treated water from local municipal drinking water treatment plant (DW) and wastewater treatment plant (WW). The efficiency of UV/H 2 O 2 process was affected by water quality. For all of the three selected antibiotics, the fastest degradation was observed in DW, and the slowest degradation occurred in WW. This phenomenon can be explained by R OH,UV , defined as the experimentally determined ·OH radical exposure per UV fluence. The R OH,UV values represent the background ·OH radical scavenging in water matrix, obtained by the degradation of para-chlorobenzoic acid (pCBA), a probe compound. In natural water, the indirect degradation of CIP did not significantly increase with the addition of H 2 O 2 due to its effective degradation by UV direct photolysis. Moreover, the formation of several photoproducts and oxidation products of antibiotics in UV/H 2 O 2 process was identified using GC-MS. Toxicity assessed by Vibrio fischer (V. fischer), was increased in UV photolysis, for the photoproducts still preserving the characteristic structure of the parent compounds. While in UV/H 2 O 2 process, toxicity increased first, and then decreased; nontoxic products were formed by the oxidation of ·OH radical. In this process, detoxification was much easier than mineralization for the tested antibiotics, and the optimal time for the degradation of pollutants in UV/H 2 O 2 process would be determined by parent compound degradation and toxicity changes.

  13. Impact of fouling on UV effectiveness

    International Nuclear Information System (INIS)

    Dykstra, T.S.; Chauret, C.

    2002-01-01

    In recent years ultraviolet light has gained in popularity as an attractive disinfection alternative due to its ability to inactivate bacteria and viruses. UV light has the potential to inactivate Cryptosporidium parvum and Giardia lamblia with a very low potential for the formation of harmful disinfection by-products. Previous studies have reported that particulate material present in the water can act to reduce the exposure of UV light to the receiving waters and that the interference of organic particles can serve to protect bacteria and viruses from intended disinfection. Disinfection capacity can also be reduced by organics in the source water that can accumulate on the surface of quartz sleeves. The purpose of this study was to determine the ability of a medium pressure UV light, at drinking water treatment levels, to inactivate MS 2 bacteriophage after a quartz tube has been fouled with organic rich source water for a 12- week period. To this end the inactivation of MS 2 was determined under clean and fouled conditions, in the presence and absence of humic rich water. The effect of lamp age on inactivation was also investigated. The results suggest that organic fouling of a quartz tube has a significant impact on the disinfection capacity of a medium pressure UV lamp. The presence of organics in the source water also plays a significant role in reducing the capacity of UV for bacterial and viral disinfection. Lamp age also seems to have some effect on the efficiency of UV disinfection. (author)

  14. Effect of UV irradiation on the apoptosis and necrosis of Jurkat cells using UV LEDs

    Science.gov (United States)

    Inada, Shunko A.; Amano, Hiroshi; Akasaki, Isamu; Morita, Akimichi; Kobayashi, Keiko

    2009-02-01

    Phototherapy is a very effective method for treating most of the incurable skin diseases. A fluorescent light bulb is used as a conventional UV light source for this type of therapy. However, infrared radiation from the light source sometimes causes serious problems on patient's health. In addition, the normal part of the skin is irradiated when a large fluorescent light bulb is used. Moreover, a conventional UV irradiation system is heavy and has a short lifetime and a high electrical power consumption. Therefore, a new UV light source for solving the problems of phototherapy is required. To realize low-power-consumption, lightweight and long-lifetime systems, group III nitride-based UV-A1 light-emitting diodes (LEDs) were investigated. We examined the UV LED irradiation of Jurkat cell, which is a tumor cell and more sensitive to UV light than a healthy cell. The numbers of apoptotic and necrotic cells were confirmed to be the same using a UV LED and a conventional lamp system. The UV LED showed the possibility of realizing a new UV light source for phototherapy.

  15. Effects of UV radiation on phytoplankton

    Science.gov (United States)

    Smith, Raymond C.; Cullen, John J.

    1995-07-01

    It is now widely documented that reduced ozone will result in increased levels of ultraviolet (UV) radiation, especially UV-B (280-320nm), incident at the surface of the earth [Watson, 1988; Anderson et al., 1991; Schoeberl and Hartmann, 1991; Frederick and Alberts, 1991; WMO, 1991; Madronich, 1993; Kerr and McElroy, 1993], and there is considerable and increasing evidence that these higher levels of UV-B radiation may be detrimental to various forms of marine life in the upper layers of the ocean. With respect to aquatic ecosystems, we also know that this biologically- damaging mid-ultraviolet radiation can penetrate to ecologically- significant depths in marine and freshwater systems [Jerlov, 1950; Lenoble, 1956; Smith and Baker, 1979; Smith and Baker, 1980; Smith and Baker, 1981; Kirk et al., 1994]. This knowledge, plus the dramatic decline in stratospheric ozone over the Antarctic continent each spring, now known to be caused by anthropogenically released chemicals [Solomon, 1990; Booth et al., 1994], has resulted in increased UV-environmental research and a number of summary reports. The United Nations Environmental Program (UNEP) has provided recent updates with respect to the effects of ozone depletion on aquatic ecosystems (Hader, Worrest, Kumar in UNEP 1989, 1991, Hader, Worrest, Kumar and Smith UNEP 1994) and the Scientific Committee on Problems of the Environment (SCOPE) has provided [SCOPE, 1992] a summary of the effects of increased UV radiation on biological systems. SCOPE has also reported [SCOPE, 1993] on the effects of increased UV on the biosphere. In addition, several books have recently been published reviewing various aspects of environmental UV photobiology [Young et al., 1993], UV effects on humans, animals and plants [Tevini, 1993], the biological effects of UV radiation in Antarctica [Weiler and Penhale, 1994], and UV research in freshwater ecosystems [Williamson and Zagarese, 1994]. Several other reviews are relevant [NAS, 1984; Caldwell

  16. Antibacterial surface design - Contact kill

    Science.gov (United States)

    Kaur, Rajbir; Liu, Song

    2016-08-01

    Designing antibacterial surfaces has become extremely important to minimize Healthcare Associated Infections which are a major cause of mortality worldwide. A previous biocide-releasing approach is based on leaching of encapsulated biocides such as silver and triclosan which exerts negative impacts on the environment and potentially contributes to the development of bacterial resistance. This drawback of leachable compounds led to the shift of interest towards a more sustainable and environmentally friendly approach: contact-killing surfaces. Biocides that can be bound onto surfaces to give the substrates contact-active antibacterial activity include quaternary ammonium compounds (QACs), quaternary phosphoniums (QPs), carbon nanotubes, antibacterial peptides, and N-chloramines. Among the above, QACs and N-chloramines are the most researched contact-active biocides. We review the engineering of contact-active surfaces using QACs or N-chloramines, the modes of actions as well as the test methods. The charge-density threshold of cationic surfaces for desired antibacterial efficacy and attempts to combine various biocides for the generation of new contact-active surfaces are discussed in detail. Surface positive charge density is identified as a key parameter to define antibacterial efficacy. We expect that this research field will continue to attract more research interest in view of the potential impact of self-disinfective surfaces on healthcare-associated infections, food safety and corrosion/fouling resistance required on industrial surfaces such as oil pipes and ship hulls.

  17. Contact Estimation in Robot Interaction

    Directory of Open Access Journals (Sweden)

    Filippo D'Ippolito

    2014-07-01

    Full Text Available In the paper, safety issues are examined in a scenario in which a robot manipulator and a human perform the same task in the same workspace. During the task execution, the human should be able to physically interact with the robot, and in this case an estimation algorithm for both interaction forces and a contact point is proposed in order to guarantee safety conditions. The method, starting from residual joint torque estimation, allows both direct and adaptive computation of the contact point and force, based on a principle of equivalence of the contact forces. At the same time, all the unintended contacts must be avoided, and a suitable post-collision strategy is considered to move the robot away from the collision area or else to reduce impact effects. Proper experimental tests have demonstrated the applicability in practice of both the post-impact strategy and the estimation algorithms; furthermore, experiments demonstrate the different behaviour resulting from the adaptation of the contact point as opposed to direct calculation.

  18. Contact-impact algorithms on parallel computers

    International Nuclear Information System (INIS)

    Zhong Zhihua; Nilsson, Larsgunnar

    1994-01-01

    Contact-impact algorithms on parallel computers are discussed within the context of explicit finite element analysis. The algorithms concerned include a contact searching algorithm and an algorithm for contact force calculations. The contact searching algorithm is based on the territory concept of the general HITA algorithm. However, no distinction is made between different contact bodies, or between different contact surfaces. All contact segments from contact boundaries are taken as a single set. Hierarchy territories and contact territories are expanded. A three-dimensional bucket sort algorithm is used to sort contact nodes. The defence node algorithm is used in the calculation of contact forces. Both the contact searching algorithm and the defence node algorithm are implemented on the connection machine CM-200. The performance of the algorithms is examined under different circumstances, and numerical results are presented. ((orig.))

  19. Optimizing UV Index determination from broadband irradiances

    Science.gov (United States)

    Tereszchuk, Keith A.; Rochon, Yves J.; McLinden, Chris A.; Vaillancourt, Paul A.

    2018-03-01

    A study was undertaken to improve upon the prognosticative capability of Environment and Climate Change Canada's (ECCC) UV Index forecast model. An aspect of that work, and the topic of this communication, was to investigate the use of the four UV broadband surface irradiance fields generated by ECCC's Global Environmental Multiscale (GEM) numerical prediction model to determine the UV Index. The basis of the investigation involves the creation of a suite of routines which employ high-spectral-resolution radiative transfer code developed to calculate UV Index fields from GEM forecasts. These routines employ a modified version of the Cloud-J v7.4 radiative transfer model, which integrates GEM output to produce high-spectral-resolution surface irradiance fields. The output generated using the high-resolution radiative transfer code served to verify and calibrate GEM broadband surface irradiances under clear-sky conditions and their use in providing the UV Index. A subsequent comparison of irradiances and UV Index under cloudy conditions was also performed. Linear correlation agreement of surface irradiances from the two models for each of the two higher UV bands covering 310.70-330.0 and 330.03-400.00 nm is typically greater than 95 % for clear-sky conditions with associated root-mean-square relative errors of 6.4 and 4.0 %. However, underestimations of clear-sky GEM irradiances were found on the order of ˜ 30-50 % for the 294.12-310.70 nm band and by a factor of ˜ 30 for the 280.11-294.12 nm band. This underestimation can be significant for UV Index determination but would not impact weather forecasting. Corresponding empirical adjustments were applied to the broadband irradiances now giving a correlation coefficient of unity. From these, a least-squares fitting was derived for the calculation of the UV Index. The resultant differences in UV indices from the high-spectral-resolution irradiances and the resultant GEM broadband irradiances are typically within 0

  20. Influence of interconnection on the long-term reliability of UV LED packages

    Science.gov (United States)

    Nieland, S.; Mitrenga, D.; Karolewski, D.; Brodersen, O.; Ortlepp, T.

    2017-02-01

    High power LEDs have conquered the mass market in recent years. Besides the main development focus to achieve higher productivity in the field of visible semiconductor LED processing, the wavelength range is further enhanced by active research and development in the direction of UVA / UVB / UVC. UVB and UVC LEDs are new and promising due to their numerous advantages. UV LEDs emit in a near range of one single emission peak with a width (FWHM) below 15 nm compared to conventional mercury discharge lamps and xenon sources, which show broad spectrums with many emission peaks over a wide range of wavelengths. Furthermore, the UV LED size is in the range of a few hundred microns and offers a high potential of significant system miniaturization. Of course, LED efficiency, lifetime and output power have to be increased [1]. Lifetime limiting issues of UVB/UVC-LED are the very high thermal stress in the chip resulting from the higher forward voltages (6-10 V @ 350 mA), the lower external quantum efficiency, below 10 % (most of the power disappears as heat), and the thermal resistance Rth of conventional LED packages being not able to dissipate these large amounts of heat for spreading. Beside the circuit boards and submounts which should have maximum thermal conductivity, the dimension of contacts as well as the interconnection of UV LED to the submount/package determinates the resolvable amount of heat [2]. In the paper different innovative interconnection techniques for UVC-LED systems will be discussed focused on the optimization of thermal conductivity in consideration of the assembly costs. Results on thermal simulation for the optimal contact dimensions and interconnections will be given. In addition, these theoretical results will be compared with results on electrical characterization as well as IR investigations on real UV LED packages in order to give recommendations for optimal UV LED assembly.

  1. Influence of uvA on the erythematogenic and therapeutic effects of uvB irradiation in psoriasis; photoaugmentation effects

    International Nuclear Information System (INIS)

    Boer, J.; Schothorst, A.A.; Suurmond, D.

    1981-01-01

    The effect of repeated exposure to an additive dose of long ultraviolet (uvA) radiation on the erythemogenic and therapeutic effects of middle ultraviolet (uvB) irradiation was investigated in 8 patients with psoriasis. The surface of the backs of these patients was divided into 2 parts, 1 of which received only uvB irradiation 4 times a week and the other uvA + uvB. uvB was provided by Philips TL-12 lamps and uvA by glass-filtered Philips TL-09 lamps. uvA was held constantly at 10 J/cm2, whereas uvB alone were evaluated by 4 tests during the treatment to determine the minimal erythema dose (MED). Test I (at the start of the therapy) showed a photoaugmentative effect which was no longer apparent in Test III (third week). Test III showed a reversal of the ratios of the MEDs of the sites irradiated with the uvA + uvB and uvB (MED A + B/MED B). This is ascribed to the marked pigmentation which appeared after repeated irradiation with the uvA + uvB combination. Comparison showed for the improvement of the psoriasis no distinct differences between uvA + uvB irradiation and uvB alone, but the former had the cosmetic advantage of giving pleasing tan

  2. Device including a contact detector

    DEFF Research Database (Denmark)

    2011-01-01

    arms (12) may extend from the supporting body in co-planar relationship with the first surface. The plurality of cantilever arms (12) may extend substantially parallel to each other and each of the plurality of cantilever arms (12) may include an electrical conductive tip for contacting the area......The present invention relates to a probe for determining an electrical property of an area of a surface of a test sample, the probe is intended to be in a specific orientation relative to the test sample. The probe may comprise a supporting body defining a first surface. A plurality of cantilever...... of the test sample by movement of the probe relative to the surface of the test sample into the specific orientation.; The probe may further comprise a contact detector (14) extending from the supporting body arranged so as to contact the surface of the test sample prior to any one of the plurality...

  3. All-graphene edge contacts

    DEFF Research Database (Denmark)

    Jacobsen, Kåre Wedel; Falkenberg, Jesper Toft; Papior, Nick Rübner

    2016-01-01

    Using ab-initio methods we investigate the possibility of three-terminalgraphene "T-junction" devices and show that these all-graphene edge contactsare energetically feasible when the 1D interface itself is free from foreignatoms. We examine the energetics of various junction structures as a func......Using ab-initio methods we investigate the possibility of three-terminalgraphene "T-junction" devices and show that these all-graphene edge contactsare energetically feasible when the 1D interface itself is free from foreignatoms. We examine the energetics of various junction structures...... to be in therange of 1-10 kΩμm which is comparable to the best contact resistance reportedfor edge-contacted graphene-metal contacts. We conclude that conductingall-carbon T-junctions should be feasible....

  4. Contact Lenses for Color Blindness.

    Science.gov (United States)

    Badawy, Abdel-Rahman; Hassan, Muhammad Umair; Elsherif, Mohamed; Ahmed, Zubair; Yetisen, Ali K; Butt, Haider

    2018-06-01

    Color vision deficiency (color blindness) is an inherited genetic ocular disorder. While no cure for this disorder currently exists, several methods can be used to increase the color perception of those affected. One such method is the use of color filtering glasses which are based on Bragg filters. While these glasses are effective, they are high cost, bulky, and incompatible with other vision correction eyeglasses. In this work, a rhodamine derivative is incorporated in commercial contact lenses to filter out the specific wavelength bands (≈545-575 nm) to correct color vision blindness. The biocompatibility assessment of the dyed contact lenses in human corneal fibroblasts and human corneal epithelial cells shows no toxicity and cell viability remains at 99% after 72 h. This study demonstrates the potential of the dyed contact lenses in wavelength filtering and color vision deficiency management. © 2018 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Methylisothiazolinone contact allergy - A review

    DEFF Research Database (Denmark)

    Lundov, M D; Krongaard, Teddy; L Menné, T

    2011-01-01

    In the early 2000s the preservative methylisothiazolinone (MI) was released as an individual preservative for industrial products and in 2005 permitted for use in cosmetic products. Up till then MI had only been used in combination with methylcholoroisthiazolinone (MCI). MCI/MI is one of the most...... frequent causes of preservative contact allergy and early studies showed that both MI and MCI are sensitizers. The prevalence of MI contact allergy is already around 1·5% and sources of exposure are associated with occupation, cosmetic products or household products. Use of MI in industrial products...... is not restricted and cases of occupational contact allergy to MI e.g. in painters are reported. The frequency of use of MI in cosmetics is low, around 1%, while up to 16·5% of household products were preserved with MI. We found 19 (1·5%) out of 1272 cosmetic products labelled with MI, primarily rinse-off products...

  6. Methylisothiazolinone contact allergy: a review

    DEFF Research Database (Denmark)

    Lundov, M D; Krongaard, T; Menné, T L

    2011-01-01

    In the early 2000s the preservative methylisothiazolinone (MI) was released as an individual preservative for industrial products and in 2005 permitted for use in cosmetic products. Up till then MI had only been used in combination with methylcholoroisthiazolinone (MCI). MCI/MI is one of the most...... frequent causes of preservative contact allergy and early studies showed that both MI and MCI are sensitizers. The prevalence of MI contact allergy is already around 1·5% and sources of exposure are associated with occupation, cosmetic products or household products. Use of MI in industrial products...... is not restricted and cases of occupational contact allergy to MI e.g. in painters are reported. The frequency of use of MI in cosmetics is low, around 1%, while up to 16·5% of household products were preserved with MI. We found 19 (1·5%) out of 1272 cosmetic products labelled with MI, primarily rinse-off products...

  7. Monitoring and control of UV and UV-TiO2 disinfections for municipal wastewater reclamation using artificial neural networks

    International Nuclear Information System (INIS)

    Lin, Chuang-Hung; Yu, Ruey-Fang; Cheng, Wen-Po; Liu, Chun-Ru

    2012-01-01

    Highlights: ► ANN models can effectively control both UV and UV-TiO 2 disinfections for wastewater reuse. ► Comparing to UV disinfection, UV-TiO 2 disinfection can save 13.2–15.7% of UV dosage and capacity. ► SS decreases disinfection efficiency when UV doses were 2 . - Abstract: The use of ultraviolet (UV) irradiation as a physical wastewater disinfection has increased in recent years, especially for wastewater reuse. The UV-TiO 2 can generate OH radicals, which is highly effective to inactivate microorganisms in wastewater disinfection. However, both UV and UV-TiO 2 disinfections create multiple physical, chemical, and bio-chemical phenomena that affect their germicidal efficiency. It is difficult to build a precise control model using existing mathematic models. This study applies artificial neural network (ANN) models to control UV and UV-TiO 2 disinfections. Experimental results indicate that the ANN models, which precisely generate relationships among multiple monitored parameters, total coliform counts in influent and effluent, and UV doses, can be used as control models for UV and UV-TiO 2 disinfections. A novel ANN control strategy is applied to control UV and UV-TiO 2 disinfection processes to meet three total coliform count limits for three wastewater reuse purposes. The proposed controlled strategy effectively controls UV and UV-TiO 2 disinfection, resulting in acceptable total coliform counts in effluent for the three wastewater reuse purposes. The required UV doses for UV-TiO 2 disinfection were lower than those for UV disinfection, resulting in energy saving and capacity reduction of 13.2–15.7%.

  8. Variable reluctance switch avoids contact corrosion and contact bounce

    Science.gov (United States)

    Watson, P. C.

    1967-01-01

    Variable reluctance switch avoids contact corrosion and bounce in a hostile environment. It consists of a wire-wound magnetic core and moveable bridge piece that alters the core flux pattern to produce an electrical output useful for switching control media.

  9. Homotopy classification of contact foliations on open contact manifolds

    Indian Academy of Sciences (India)

    64

    Let ξt, t ∈ [0, 1] be a continuous family of contact structures defined by the ... here is based on ideas that can be found in [5] and [8] and may be known to experts. ..... the bigger rectangle represents the set U ×Iε1 and the central dotted line.

  10. Contact Dynamics of EHL Contacts under Time Varying Conditions

    NARCIS (Netherlands)

    Venner, Cornelis H.; Popovici, G.; Wijnant, Ysbrand H.; Dalmaz, G.; Lubrecht, A.A.; Priest, M

    2004-01-01

    By means of numerical simulations of two situations with time varying operating conditions it is shown that the dynamic behaviour of Elasto-Hydrodynamically Lubricated contacts in terms of vibrations can be characterized as: Changes in the mutual approach lead to film thickness changes in the inlet

  11. The UV Sensor Onboard the Mars Science Laboratory Mission: Correction and Generation of UV Fluxes

    Science.gov (United States)

    Vicente-Retortillo, Á.; Martinez, G.; Renno, N. O.; Lemmon, M. T.; Gomez-Elvira, J.

    2017-12-01

    The Rover Environmental Monitoring Station UV sensor (UVS) onboard the Mars Science Laboratory mission has completed more than 1750 sols of measurements, providing an unprecedented coverage ranging from diurnal to interannual times scales [1,2]. The UVS is comprised of six photodiodes to measure the UV flux in the ranges 200-380, 320-380, 280-320, 200-280, 230-290 and 300-350 nm [3]. UV fluxes in units of W/m2 can be found in the NASA Planetary Data System (PDS). However, dust deposition on the UVS and a non-physical discontinuity in the calibration functions when the solar zenith angle is above 30º cause errors in these fluxes that increase with time. We have developed a technique to correct UV fluxes from the effects of dust degradation and inconsistencies in the angular response of the UVS. The photodiode output currents (available in the PDS as lower-level TELRDR products), ancillary data records (available in the PDS as ADR products) and dust opacity values derived from Mastcam observations are used for performing the corrections. The corrections have been applied to the UVA band (320-380 nm) for the first 1000 sols of the mission, providing excellent results [4]. We plan to correct the UV fluxes on each of the six UVS bands and to make these results available in the PDS. Data products generated by this study will allow comparisons of the UV radiation environment at Gale crater with that at the locations of the future missions ExoMars 2020 and Mars 2020, as well as the assessment of the potential survivability of biological contaminants brought to Mars from Earth. References: [1] Smith, M. D., et al. (2016), Aerosol optical depth as observed by the Mars Science Laboratory REMS UV photodiodes, Icarus, 280, 234-248. [2] Vicente-Retortillo, Á., et al. (2017), Determination of dust aerosol particle size at Gale Crater using REMS UVS and Mastcam measurements, Geophys. Res. Lett., 44, 3502-3508. [3] Gómez-Elvira, J., et al. (2012), REMS: The environmental sensor

  12. Fragrance contact allergy in Iran.

    Science.gov (United States)

    Firooz, A; Nassiri-Kashani, M; Khatami, A; Gorouhi, F; Babakoohi, S; Montaser-Kouhsari, L; Davari, P; Dowlati, Y

    2010-12-01

    Fragrances are considered as one of the most common causes of allergic contact dermatitis. About 1-4% of the general population suffer from fragrance contact allergy (FCA). To determine the frequency of FCA and its clinical relevance in a sample of Iranian patients with history of contact and/or atopic dermatitis from January 2004 to December 2008. Standardized patch testing with 28-allergen screening series recommended by the German Contact Dermatitis Research Group and European Standard Series was used at six dermatological clinics in Iran. Fragrance allergens comprised of fragrance mix I (FM I), Myroxylon pereirae (MP; balsam of Peru), Lyral, turpentine and FM II. Fragrance contact allergy was detected in 7.2% of the patients. The frequency of positive reactions to FM I, MP and FM II were 3.7% (41/1105), 2.8% (32/1135) and 1.1% (3/267) respectively. 82.4% of the reactions to fragrance allergens were clinically relevant. The most common involved areas were hands (68.4%) and face (35.4%). Fragrance allergy predominantly affected women aged more than 40 years (P=0.008). Positive reaction to more than two allergens was significantly higher in FCA patients compared with other contact dermatitis patients (P<0.0001), and FM I, nickel and MP were the most frequent allergens in these patients. Despite less frequency of FCA in comparison with some European countries, its clinical relevance in Iranian patients seems to be high. It mostly affects the hands and the face predominantly in women aged more than 40 years. © 2010 The Authors. Journal compilation © 2010 European Academy of Dermatology and Venereology.

  13. Metal Contacts to Gallium Arsenide.

    Science.gov (United States)

    Ren, Fan

    1991-07-01

    While various high performance devices fabricated from the gallium arsenide (GaAs) and related materials have generated considerable interest, metallization are fundamental components to all semiconductor devices and integrated circuits. The essential roles of metallization systems are providing the desired electrical paths between the active region of the semiconductor and the external circuits through the metal interconnections and contacts. In this work, in-situ clean of native oxide, high temperature n-type, low temperature n-type and low temperature p-type ohmic metal systems have been studied. Argon ion mill was used to remove the native oxide prior to metal deposition. For high temperature process n-type GaAs ohmic contacts, Tungsten (W) and Tungsten Silicide (WSi) were used with an epitaxial grown graded Indium Gallium Arsenide (InGaAs) layer (0.2 eV) on GaAs. In addition, refractory metals, Molybdenum (Mo), was incorporated in the Gold-Germanium (AuGe) based on n-type GaAs ohmic contacts to replace conventional silver as barrier to prevent the reaction between ohmic metal and chlorine based plasma as well as the ohmic metallization intermixing which degrades the device performance. Finally, Indium/Gold-Beryllium (In/Au-Be) alloy has been developed as an ohmic contact for p-type GaAs to reduce the contact resistance. The Fermi-level pinning of GaAs has been dominated by the surface states. The Schottky barrier height of metal contacts are about 0.8 V regardless of the metal systems. By using p-n junction approach, barrier height of pulsed C-doped layers was achieved as high as 1.4 V. Arsenic implantation into GaAs method was also used to enhance the barrier height of 1.6 V.

  14. Response surface methodology as a tool for modeling and optimization of Bacillus subtilis spores inactivation by UV/ nano-Fe0 process for safe water production.

    Science.gov (United States)

    Yousefzadeh, Samira; Matin, Atiyeh Rajabi; Ahmadi, Ehsan; Sabeti, Zahra; Alimohammadi, Mahmood; Aslani, Hassan; Nabizadeh, Ramin

    2018-04-01

    One of the most important aspects of environmental issues is the demand for clean and safe water. Meanwhile, disinfection process is one of the most important steps in safe water production. The present study aims at estimating the performance of UV, nano Zero-Valent Iron particles (nZVI, nano-Fe 0 ), and UV treatment with the addition of nZVI (combined process) for Bacillus subtilis spores inactivation. Effects of different factors on inactivation including contact time, initial nZVI concentration, UV irradiance and various aerations conditions were investigated. Response surface methodology, based on a five-level, two variable central composite design, was used to optimize target microorganism reduction and the experimental parameters. The results indicated that the disinfection time had the greatest positive impact on disinfection ability among the different selected independent variables. According to the results, it can be concluded that microbial reduction by UV alone was more effective than nZVI while the combined UV/nZVI process demonstrated the maximum log reduction. The optimum reduction of about 4 logs was observed at 491 mg/L of nZVI and 60 min of contact time when spores were exposed to UV radiation under deaerated condition. Therefore, UV/nZVI process can be suggested as a reliable method for Bacillus subtilis spores inactivation. Copyright © 2018. Published by Elsevier Ltd.

  15. Mechanisms of uv mutagenesis in yeast

    International Nuclear Information System (INIS)

    Lawrence, C.W.; Christensen, R.; Schwartz, A.

    1982-01-01

    The uv mutagenesis in yeast depends on the function of the RAD6 locus, a gene that is also responsible for a substantial fraction of wild-type resistance, suggesting that this eukaryote may possess a misrepair mechanism analogous to that proposed for Escherichia coli. The molecular mechanism responsible for RAD6 repair or recovery is not yet known, but it is different from either excision or recombination-dependent repair, processes carried out by the other two main repair pathways in yeast. RAD6-dependent mutagenesis has been found to have the following characteristics. It is associated at best with only a small fraction of RAD6-dependent repair, the majority of the sensitivity of rad6 mutants being due to their lack of nonmutagenic repair. SRS2 metabolic suppressors restore a substantial fraction of uv resistance to rad6 mutants but do not restore their uv mutability. Strains containing mutations at loci (rev, umr) that are probably more directly involved in mutagenesis are only mildly sensitive, and there is a poor correlation between their sensitivity and mutational deficiency. The uv mutagenesis appears to require a large number of gene functions, perhaps ten or more. Where examined in detail, these genes have been found to be concerned in the production of only a specific range of mutational events, not all of them. Mating experiments have shown that a substantial fraction, probably 40% or more, of uv-induced mutations are untargeted, that is, occur in lesion-free regions of DNA. The uv irradiation, therefore, produces a general reduction in the normally high fidelity with which DNA is replicated on undamaged templates. It does not appear to be necessary for the causal lesion to be present in the same chromosome as the mutation it induces. The reduction in fidelity may be the consequence of the production of a diffusible factor in uv-irradiated cells, but definite evidence supporting this proposal has not yet been obtained

  16. Superstring amplitudes and contact interactions

    International Nuclear Information System (INIS)

    Greensite, J.

    1987-08-01

    We show that scattering amplitudes computed from light-cone superstring field theory are divergent at tree level. The divergences can be eliminated, and supersymmetry restored, by the addition of certain counter terms to the light-cone Hamiltonian. These counter terms have the form of local contact interactions, whose existence we had previously deduced on grounds of vacuum stability, and closure of the super-Poincare algebra. The quartic contact interactions required in Type I and Type IIB superstring theories are constructed in detail. (orig.)

  17. Clinical update on contact allergy

    DEFF Research Database (Denmark)

    Uter, Wolfgang; Johansen, Jeanne Duus; Orton, David I

    2005-01-01

    PURPOSE OF REVIEW: The aim of this article is to review recent findings in contact allergy, regarding clinical research. RECENT FINDINGS: The biocide methyldibromo glutaronitrile was identified to be an important sensitizer. Subsequently, it was banned from leave-on cosmetics in the European Union...... a classification of newly introduced chemicals; increasingly, the local lymph node assay is supplementing and potentially replacing the guinea pig maximization test. Recent advances in occupational contact allergy include, for example, some attempts to improve diagnostics for epoxy resin and other plastic, glue...

  18. CONTACT DERMATITIS AMONG CONSTRUCTION WORKERS

    Directory of Open Access Journals (Sweden)

    Ida Ayu Diah Purnama Sari

    2013-02-01

    Full Text Available Contact dermatitis is a form of skin inflammation with spongiosis or intercellular edema of the epidermis due to the interaction of irritants and allergens. While occupational contact dermatitis is an inflammation of the skin due to exposure to irritants or allergens in the workplace. One of the jobs that have a high risk of the disease are construction workers. Although the disease is rarely-threatening but can cause high morbidity and suffering for workers, so it can affect the economy and quality of life of patients.

  19. Use of satellite erythemal UV products in analysing the global UV changes

    Directory of Open Access Journals (Sweden)

    I. Ialongo

    2011-09-01

    Full Text Available Long term changes in solar UV radiation affect global bio-geochemistry and climate. The satellite-based dataset of TOMS (Total Ozone Monitoring System and OMI (Ozone Monitoring Instrument of erythemal UV product was applied for the first time to estimate the long-term ultraviolet (UV changes at the global scale. The analysis of the uncertainty related to the different input information is presented. OMI and GOME-2 (Global Ozone Monitoring Experiment-2 products were compared in order to analyse the differences in the global UV distribution and their effect on the linear trend estimation.

    The results showed that the differences in the inputs (mainly surface albedo and aerosol information used in the retrieval, affect significantly the UV change calculation, pointing out the importance of using a consistent dataset when calculating long term UV changes. The areas where these differences played a major role were identified using global maps of monthly UV changes. Despite the uncertainties, significant positive UV changes (ranging from 0 to about 5 %/decade were observed, with higher values in the Southern Hemisphere at mid-latitudes during spring-summer, where the largest ozone decrease was observed.

  20. The World Space Observatory Ultraviolet (WSO-UV), as a bridge to future UV astronomy

    Science.gov (United States)

    Shustov, B.; Gómez de Castro, A. I.; Sachkov, M.; Vallejo, J. C.; Marcos-Arenal, P.; Kanev, E.; Savanov, I.; Shugarov, A.; Sichevskii, S.

    2018-04-01

    Ultraviolet (UV) astronomy is a vital branch of space astronomy. Many dozens of short-term UV-experiments in space, as well as long-term observatories, have brought a very important knowledge on the physics and chemistry of the Universe during the last decades. Unfortunately, no large UV-observatories are planned to be launched by most of space agencies in the coming 10-15 years. Conversely, the large UVOIR observatories of the future will appear not earlier than in 2030s. This paper briefly describes the projects that have been proposed by various groups. We conclude that the World Space Observatory-Ultraviolet (WSO-UV) will be the only 2-m class UV telescope with capabilities similar to those of the HST for the next decade. The WSO-UV has been described in detail in previous publications, and this paper updates the main characteristics of its instruments and the current state of the whole project. It also addresses the major science topics that have been included in the core program of the WSO-UV, making this core program very relevant to the current state of the UV-astronomy. Finally, we also present here the ground segment architecture that will implement this program.