Simultaneous analysis of residual stress and stress intensity factor in a resist after UV-nanoimprint lithography based on electron moiré fringes

International Nuclear Information System (INIS)

Wang, Qinghua; Kishimoto, Satoshi

2012-01-01

In this study, the residual stress in a resist (PAK01) film and the stress intensity factor (SIF) of an induced crack are simultaneously estimated during ultraviolet nanoimprint lithography (UV-NIL) based on electron moiré fringes. A micro grid in a triangular arrangement on the resist film fabricated by UV-NIL is directly used as the model grid. Electron moiré fringes formed by the interference between the fabricated grid and the electron scan beam are used to measure the displacement distribution around the tip of a crack induced by the residual stress in the resist. The SIF of the crack is estimated using a displacement extrapolation method. The residual strain fields and the corresponding residual stress in the resist film far from the crack are determined and analyzed. This method is effective for evaluating the grid quality fabricated by the UV-NIL technique. (paper)

Transfer the multiscale texture of crystalline Si onto thin-film micromorph cell by UV nanoimprint for light trapping

Science.gov (United States)

Liu, Daiming; Wang, Qingkang; Wang, Qing

2018-05-01

Surface texturing is of great significance in light trapping for solar cells. Herein, the multiscale texture, consisting of microscale pyramids and nanoscale porous arrangement, was fabricated on crystalline Si by KOH etching and Ag-assisted HF etching processes and subsequently replicated onto glass with high fidelity by UV nanoimprint method. Light trapping of the multiscale texture was studied by spectral (reflectance, haze ratio) characterizations. Results reveal the multiscale texture provides the broadband reflection reducing, the highlighted light scattering and the additional self-cleaning behaviors. Compared with bare cell, the multiscale textured micromorph cell achieves a 4% relative increase in power conversion efficiency. This surface texturing route paves a promising way for developing low-cost, large-scale and high-efficiency solar applications.

Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography

NARCIS (Netherlands)

Khan, M.U.; Justice, J.; Petäjä, J.; Korhonen, T.; Boersma, A.; Wiegersma, S.; Karppinen, M.; Corbett, B.

2015-01-01

Single and multi-layer passive optical interconnects using single mode polymer waveguides are demonstrated using UV nano-imprint lithography. The fabrication tolerances associated with imprint lithography are investigated and we show a way to experimentally quantify a small variation in index

Nanoimprint Lithography on curved surfaces prepared by fused deposition modelling

International Nuclear Information System (INIS)

Köpplmayr, Thomas; Häusler, Lukas; Bergmair, Iris; Mühlberger, Michael

2015-01-01

Fused deposition modelling (FDM) is an additive manufacturing technology commonly used for modelling, prototyping and production applications. The achievable surface roughness is one of its most limiting aspects. It is however of great interest to create well-defined (nanosized) patterns on the surface for functional applications such as optical effects, electronics or bio-medical devices. We used UV-curable polymers of different viscosities and flexible stamps made of poly(dimethylsiloxane) (PDMS) to perform Nanoimprint Lithography (NIL) on FDM-printed curved parts. Substrates with different roughness and curvature were prepared using a commercially available 3D printer. The nanoimprint results were characterized by optical light microscopy, profilometry and atomic force microscopy (AFM). Our experiments show promising results in creating well-defined microstructures on the 3D-printed parts. (paper)

Fabrication of a Ni nano-imprint stamp for an anti-reflective layer using an anodic aluminum oxide template.

Science.gov (United States)

Park, Eun-Mi; Lim, Seung-Kyu; Ra, Senug-Hyun; Suh, Su-Jung

2013-11-01

Aluminum anodizing can alter pore diameter, density distribution, periodicity and layer thickness in a controlled way. Because of this property, porous type anodic aluminum oxide (AAO) was used as a template for nano-structure fabrication. The alumina layer generated at a constant voltage increased the pore size from 120 nm to 205 nm according to an increasing process time from 60 min to 150 min. The resulting fabricated AAO templates had pore diameters at or less than 200 nm. Ni was sputtered as a conductive layer onto this AAO template and electroplated using DC and pulse power. Comparing these Ni stamps, those generated from electroplating using on/reverse/off pulsing had an ordered pillar array and maintained the AAO template morphology. This stamp was used for nano-imprinting on UV curable resin coated glass wafer. Surface observations via electron microscopy showed that the nano-imprinted patterned had the same shape as the AAO template. A soft mold was subsequently fabricated and nano-imprinted to form a moth-eye structure on the glass wafer. An analysis of the substrate transmittance using UV-VIS/NIR spectroscopy showed that the transmittance of the substrate with the moth-eye structure was 5% greater that the non-patterned substrate.

Nano-imprint gold grating as refractive index sensor

International Nuclear Information System (INIS)

Kumari, Sudha; Mohapatra, Saswat; Moirangthem, Rakesh S.

2016-01-01

Large scale of fabrication of plasmonic nanostructures has been a challenging task due to time consuming process and requirement of expensive nanofabrication tools such as electron beam lithography system, focused ion beam system, and extreme UV photolithography system. Here, we present a cost-effective fabrication technique so called soft nanoimprinting to fabricate nanostructures on the larger sample area. In our fabrication process, a commercially available optical DVD disc was used as a template which was imprinted on a polymer glass substrate to prepare 1D polymer nano-grating. A homemade nanoimprinting setup was used in this fabrication process. Further, a label-free refractive index sensor was developed by utilizing the properties of surface plasmon resonance (SPR) of a gold coated 1D polymer nano-grating. Refractive index sensing was tested by exposing different solutions of glycerol-water mixture on the surface of gold nano-grating. The calculated bulk refractive index sensitivity was found to be 751nm/RIU. We believed that our proposed SPR sensor could be a promising candidate for developing low-cost refractive index sensor with high sensitivity on a large scale.

Photonic crystal structures on nonflat surfaces fabricated by dry lift-off soft UV nanoimprint lithography

International Nuclear Information System (INIS)

Sun, Tangyou; Xu, Zhimou; Xu, Haifeng; Zhao, Wenning; Wu, Xinghui; Liu, Sisi; Ma, Zhichao; He, Jian; Liu, Shiyuan; Peng, Jing

2013-01-01

The surface nonflatness induced from the material itself or the production atmosphere can lead to serious non-uniformity consequences in nanoimprint lithography (NIL) which is used for providing a low cost and high throughput nano-fabrication process. In this paper, soft UV NIL (SUNIL) processes are used for photonic crystal (PC) pattern transfer of a GaN-based light-emitting diode (LED) with patterned sapphire substrate (PSS). The results reveal a significant incompatibility between the conventional SUNIL and the nonflat p-GaN surface. Ellipse-shaped rather than circle-shaped PC structure is obtained on the p-GaN surface due the deformation of the soft mold in nonflat NIL. A dry lift-off (DLO) SUNIL is proposed to overcome the non-uniformity issue in nonflat NIL as well as the collapse problem of the free-standing pillar-shaped resist in wet lift-off. The photoluminescence enhancements of the LED fabricated by the DLO SUNIL method compared to those with conventional SUNIL and unpatterned LED are 1.41 fold and 3.48 fold, respectively. Further study shows that the DLO SUNIL is applicable in the fabrication of the PC structure with tunable duty cycle via one single initial PC mold. (paper)

Scalable fabrication of nanostructured devices on flexible substrates using additive driven self-assembly and nanoimprint lithography

Science.gov (United States)

Watkins, James

2013-03-01

Roll-to-roll (R2R) technologies provide routes for continuous production of flexible, nanostructured materials and devices with high throughput and low cost. We employ additive-driven self-assembly to produce well-ordered polymer/nanoparticle hybrid materials that can serve as active device layers, we use highly filled nanoparticle/polymer hybrids for applications that require tailored dielectric constant or refractive index, and we employ R2R nanoimprint lithography for device scale patterning. Specific examples include the fabrication of flexible floating gate memory and large area films for optical/EM management. Our newly constructed R2R processing facility includes a custom designed, precision R2R UV-assisted nanoimprint lithography (NIL) system and hybrid nanostructured materials coaters.

Boron nitride stamp for ultra-violet nanoimprinting lithography fabricated by focused ion beam lithography

International Nuclear Information System (INIS)

Altun, Ali Ozhan; Jeong, Jun-Ho; Rha, Jong-Joo; Kim, Ki-Don; Lee, Eung-Sug

2007-01-01

Cubic boron nitride (c-BN) is one of the hardest known materials (second after diamond). It has a high level of chemical resistance and high UV transmittance. In this study, a stamp for ultra-violet nanoimprint lithography (UV-NIL) was fabricated using a bi-layered BN film deposited on a quartz substrate. Deposition of the BN was done using RF magnetron sputtering. A hexagonal boron nitride (h-BN) layer was deposited for 30 min before c-BN was deposited for 30 min. The thickness of the film was measured as 160 nm. The phase of the c-BN layer was investigated using Fourier transform infrared (FTIR) spectrometry, and it was found that the c-BN layer has a 40% cubic phase. The deposited film was patterned using focused ion beam (FIB) lithography for use as a UV-NIL stamp. Line patterns were fabricated with the line width and line distance set at 150 and 150 nm, respectively. The patterning process was performed by applying different currents to observe the effect of the current value on the pattern profile. The fabricated patterns were investigated using AFM, and it was found that the pattern fabricated by applying a current value of 50 picoamperes (pA) has a better profile with a 65 nm line depth. The UV transmittance of the 160 nm thick film was measured to be 70-86%. The hardness and modulus of the BN was measured to be 12 and 150 GPa, respectively. The water contact angle of the stamp surface was measured at 75 0 . The stamp was applied to UV-NIL without coating with an anti-adhesion layer. Successful imprinting was proved via scanning electron microscope (SEM) images of the imprinted resin

The development of 8 inch roll-to-plate nanoimprint lithography (8-R2P-NIL) system

Science.gov (United States)

Lee, Lai Seng; Mohamed, Khairudin; Ooi, Su Guan

2017-07-01

Growth in semiconductor and integrated circuit industry was observed in the past decennium of years for industrial technology which followed Moore's law. The line width of nanostructure to be exposed was influenced by the essential technology of photolithography. Thus, it is crucial to have a low cost and high throughput manufacturing process for nanostructures. Nanoimprint Lithography technique invented by Stephen Y. Chou was considered as major nanolithography process to be used in future integrated circuit and integrated optics. The drawbacks of high imprint pressure, high imprint temperature, air bubbles formation, resist sticking to mold and low throughput of thermal nanoimprint lithography on silicon wafer have yet to be solved. Thus, the objectives of this work is to develop a high throughput, low imprint force, room temperature UV assisted 8 inch roll to plate nanoimprint lithography system capable of imprinting nanostructures on 200 mm silicon wafer using roller imprint with flexible mold. A piece of resist spin coated silicon wafer was placed onto vacuum chuck drives forward by a stepper motor. A quartz roller wrapped with a piece of transparent flexible mold was used as imprint roller. The imprinted nanostructures were cured by 10 W, 365 nm UV LED which situated inside the quartz roller. Heat generated by UV LED was dissipated by micro heat pipe. The flexible mold detaches from imprinted nanostructures in a 'line peeling' pattern and imprint pressure was measured by ultra-thin force sensors. This system has imprinting speed capability ranging from 0.19 mm/s to 5.65 mm/s, equivalent to imprinting capability of 3 to 20 pieces of 8 inch wafers per hour. Speed synchronization between imprint roller and vacuum chuck was achieved by controlling pulse rate supplied to stepper motor which drive the vacuum chuck. The speed different ranging from 2 nm/s to 98 nm/s is achievable. Vacuum chuck height was controlled by stepper motor with displacement of 5 nm/step.

Frequency and amplitude dependences of molding accuracy in ultrasonic nanoimprint technology

International Nuclear Information System (INIS)

Mekaru, Harutaka; Takahashi, Masaharu

2009-01-01

We use neither a heater nor ultraviolet lights, and are researching and developing an ultrasonic nanoimprint as a new nano-patterning technology. In our ultrasonic nanoimprint technology, ultrasonic vibration is not used as a heat generator instead of the heater. A mold is connected with an ultrasonic generator, and mold patterns are pushed down and pulled up at a high speed into a thermoplastic. Frictional heat is generated by ultrasonic vibration between mold patterns and thermoplastic patterns formed by an initial contact force. However, because frictional heat occurs locally, the whole mold is not heated. Therefore, a molding material can be comprehensively processed at room temperature. A magnetostriction actuator was built into our ultrasonic nanoimprint system as an ultrasonic generator, and the frequency and amplitude can be changed between dc–10 kHz and 0–4 µm, respectively. First, the ultrasonic nanoimprint was experimented by using this system on polyethylene terephthalate (PET, T g = 69 °C), whose the glass transition temperature (T g ) is comparatively low in engineering plastics, and it was ascertained that the most suitable elastic material for this technique was an ethyl urethane rubber. In addition, we used a changeable frequency of the magnetostriction actuator, and nano-patterns in an electroformed-Ni mold were transferred to a 0.5 mm thick sheet of PET, polymethylmethacrylate (PMMA) and polycarbonate (PC), which are typical engineering plastics, under variable molding conditions. The frequency and amplitude dependence of ultrasonic vibration to the molding accuracy were investigated by measuring depth and width of imprinted patterns. As a result, regardless of the molding material, the imprinted depth was changed drastically when the frequency exceeded 5 kHz. On the other hand, when the amplitude of ultrasonic vibration grew, the imprinted depth gradually deepened. Influence of the frequency and amplitude of ultrasonic vibration was not

Fabrication of Nanoimprint stamps for photonic crystals

International Nuclear Information System (INIS)

Kouba, J; Kubenz, M; Mai, A; Ropers, G; Eberhardt, W; Loechel, B

2006-01-01

We report on fabrication of nanoimprint stamps for fabrication of two dimensional photonic crystals in visible range of spectra. Nanoimprint stamps made of silicon and/or nickel were successfully fabricated using electron beam lithography and advanced dry etching techniques. The quality of the stamps was evaluated using scanning electron microscopy. The fabricated stamps were also evaluated by imprinting them into suitable polymer materials

Effects of polymer surface energy on morphology and properties of silver nanowire fabricated via nanoimprint and E-beam evaporation

Science.gov (United States)

Zhao, Zhi-Jun; Hwang, Soon Hyoung; Jeon, Sohee; Jung, Joo-Yun; Lee, Jihye; Choi, Dae-Geun; Choi, Jun-Hyuk; Park, Sang-Hu; Jeong, Jun-Ho

2017-10-01

In this paper, we demonstrate that use of different nanoimprint resins as a polymer pattern has a significant effect on the morphology of silver (Ag) nanowires deposited via an E-beam evaporator. RM-311 and Ormo-stamp resins are chosen as a polymer pattern to form a line with dimensions of width (100 nm) × space (100 nm) × height (120 nm) by using nanoimprint lithography (NIL). Their contact angles are then measured to evaluate their surface energies. In order to compare the properties of the Ag nanowires deposited on the various polymer patterns with different surface energies, hydrophobic surface treatment of the polymer pattern surface is implemented using self-assembled monolayers. In addition, gold and aluminum nanowires are fabricated for comparison with the Ag nanowires, with the differences in the nanowire morphologies being determined by the different atomic properties. The monocrystalline and polycrystalline structures of the various Ag nanowire formations are observed using transmission electron microscopy. In addition, the melting temperatures and optical properties of four kinds of Ag nanowire morphologies deposited on various polymer patterns are evaluated using a hot plate and an ultraviolet-visible (UV-vis) spectrometer, respectively. The results indicate that the morphology of the Ag nanowire determines the melting temperature and the transmission. We believe that these findings will greatly aid the development of NIL, along with physical evaporation and chemical deposition techniques, and will be widely employed in optics, biology, and surface wettability applications.

The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint.

Science.gov (United States)

Guo, Shuai; Niu, Chunhui; Liang, Liang; Chai, Ke; Jia, Yaqing; Zhao, Fangyin; Li, Ya; Zou, Bingsuo; Liu, Ruibin

2016-10-04

Based on a silica sol-gel technique, highly-structurally ordered silica photonic structures were fabricated by UV lithography and hot manual nanoimprint efforts, which makes large-scale fabrication of silica photonic crystals easy and results in low-cost. These photonic structures show perfect periodicity, smooth and flat surfaces and consistent aspect ratios, which are checked by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In addition, glass substrates with imprinted photonic nanostructures show good diffraction performance in both transmission and reflection mode. Furthermore, the reflection efficiency can be enhanced by 5 nm Au nanoparticle coating, which does not affect the original imprint structure. Also the refractive index and dielectric constant of the imprinted silica is close to that of the dielectric layer in nanodevices. In addition, the polarization characteristics of the reflected light can be modulated by stripe nanostructures through changing the incident light angle. The experimental findings match with theoretical results, making silica photonic nanostructures functional integration layers in many optical or optoelectronic devices, such as LED and microlasers to enhance the optical performance and modulate polarization properties in an economical and large-scale way.

Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

International Nuclear Information System (INIS)

Song, Sun-Sik; Kim, Eun-Uk; Jung, Hee-Soo; Kim, Ki-Seok; Jung, Gun-Young

2009-01-01

A two-step metal lift-off process using a selective etching recipe was demonstrated as a new technique for the reverse pattern fabrication of the features of a master stamp via a UV-based nanoimprint lithography technique. A transparent master stamp with repeated pillars (150 nm diameter at 300 nm pitch) was fabricated by using laser interference lithography and the subsequent dry-etching process. After nanoimprint lithography and the following gold (Au) lift-off process, the corresponding gold dots (20 nm height) were generated. A thin chromium layer (Cr, 5 nm) was then deposited and subjected to the aqua regia solution, which dissolved only Au dots. By using a selective wet etching recipe between gold (Au) and chromium (Cr) materials, a Cr layer with holes was reliably generated, which was used as an etching mask to transfer holes into the silicon substrate in the subsequent dry-etching process. Hole patterns with a diameter of 146 nm were inversely replicated faithfully from the master stamp with the corresponding pillars without a notable feature size distortion

The effect of UV-blocking contact lenses as a therapy for canine chronic superficial keratitis.

Science.gov (United States)

Denk, Nora; Fritsche, Jens; Reese, Sven

2011-05-01

To evaluate the effect of UV-blocking soft contact lenses in treatment for chronic superficial keratitus (CSK). Twenty six dogs with CSK were treated continuously with UV-blocking contact lenses for 6 months. A contact lens was placed on one eye of each dog; the other eye remained without a lens as a control eye. After this primary study, five of the dogs were further treated and they wore then contact lenses in both eyes. Continuously, all patients were concurrently treated topically with cyclosporine. The contact lenses were changed every 4 weeks and an ophthalmic examination performed. Evaluation criteria included corneal alterations as pigmentation, edema, pannus and vascularization. To determine the transmittance characteristics of the contact lenses before and after use, 32 contact lenses were measured with a UV-vis-NIR spectrophotometer. Pigmentation increased in eyes wearing lenses and in control eyes over the evaluation period of 6 months. Corneal edema increased in the eyes wearing lenses, but remained unaffected in the control eyes. A significant difference in the incidence of pannus and the extent of corneal vascularisation could not be evaluated. Adverse effects were noted in six cases (corneal edema and vascularisation, conjunctivitis, blepharospasm). All new lenses studied reduced UV-radiation to a safe level, whereas used lenses did not maintain their transmittance characteristics. No positive effect of UV-blocking contact lenses could be proven with the study design used. © 2011 American College of Veterinary Ophthalmologists.

Scanning probe lithography for nanoimprinting mould fabrication

International Nuclear Information System (INIS)

Luo Gang; Xie Guoyong; Zhang Yongyi; Zhang Guoming; Zhang Yingying; Carlberg, Patrick; Zhu Tao; Liu Zhongfan

2006-01-01

We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si(110) and Si(100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 μm by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds

Thermo-curable epoxy systems for nanoimprint lithography

International Nuclear Information System (INIS)

Wu, Chun-Chang; Hsu, Steve Lien-Chung

2010-01-01

In this work, we have used solvent-free thermo-curable epoxy systems for low-pressure and moderate-temperature nanoimprint lithography (NIL). The curing kinetic parameters and conversion of diglycidyl ether of bisphenol A (DGEBA) resin with different ambient-cure 930 and 954 hardeners were studied by the isothermal DSC technique. They are useful for the study of epoxy resins in the imprinting application. The DGEBA/930 and DGEBA/954 epoxy resists can be imprinted to obtain high-density nano- and micro-scale patterns on a flexible indium tin oxide/poly(ethylene terephthalate) (ITO/PET) substrate. The DGEBA/930 epoxy resin is not only suitable for resist material, but also for plastic mold material. Highly dense nanometer patterns can be successfully imprinted using a UV-curable resist from the DGEBA/930 epoxy mold. Using the replicated DGEBA/930 epoxy mold instead of the expensive master can prevent brittle failure of the silicon molds in the NIL

Flexible and disposable plasmonic refractive index sensor using nanoimprint lithography

Science.gov (United States)

Mohapatra, Saswat; Moirangthem, Rakesh S.

2018-03-01

Nanostructure based plasmonic sensors are highly demanding in various areas due to their label-free and real-time detection capability. In this work, we developed an inexpensive flexible plasmonic sensor using optical disc nanograting via soft UV-nanoimprint lithography (UV-NIL). The polydimethylsiloxane (PDMS) stamp was used to transfer the nanograting structure from digital versatile discs (DVDs) to flexible and transparent polyethylene terephthalate (PET) substrate. Further, the plasmonic sensing substrate was obtained after coating a gold thin film on the top of the imprinted sample. The surface plasmon resonance (SPR) modes excited on gold coated nanograting structure appeared as a dip in the reflectance spectra measured at normal incident of white light in ambient air medium. Electromagnetic simulation based on finite element method (FEM) was used to understand and analyze the excited SPR modes and it is a very close agreement with the experimental results. The bulk refractive index (RI) sensing was performed by the sensor chip using water-glycerol mixture with different concentrations. Experimentally, the bulk RI sensitivity was found to be 797+/-17 nm/RIU.

Discrete dislocation simulations of the flattening of nanoimprinted surfaces

International Nuclear Information System (INIS)

Zhang, Yunhe; Nicola, Lucia; Van der Giessen, Erik

2010-01-01

Simulations of rough surface flattening are performed on thin metal films whose roughness is created by nanoimprinting flat single crystals. The imprinting is carried out by means of a rigid template with equal flat contacts at varying spacing. The imprinted surfaces are subsequently flattened by a rigid platen, while the change of roughness and surface profile is computed. Attention is focused mainly on comparing the response of the film surfaces with those of identical films cleared of the dislocations and residual stresses left by the imprinting process. The aim of these studies is to understand to what extent the loading history affects deformation and roughness during flattening. The limiting cases of sticking and frictionless contact between rough surface and platen are analyzed. Results show that when the asperities are flattened such that the contact area is up to about one third of the surface area, the loading history strongly affects the flattening. Specifically, the presence of initial dislocations facilitates the squeezing of asperities independently of the friction conditions of the contact. For larger contact areas, the initial conditions affect only sticking contacts, while frictionless contacts lead to a homogeneous flattening of the asperities due to yield of the metal film. In all cases studied the final surface profile obtained after flattening has little to no resemblance to the original imprinted surface

Plasma-assisted quartz-to-quartz direct bonding for the fabrication of a multilayered quartz template for nanoimprint lithography

International Nuclear Information System (INIS)

Lee, Jihye; Ali, Altun; Kim, Ki-don; Choi, Dae-guen; Choi, Jun-Hyuk; Jeong, Jun-ho; Kim, Jae-Hyun

2010-01-01

In this paper, a low-temperature plasma-assisted process is developed to realize a uniform, ultraviolet (UV) transparent and chemically inert quartz-to-quartz direct bonding. Two sets of pretests are performed in order to understand how the bond surface energy changes with the plasma exposure time and the wet etching of quartz, respectively. The developed technique is used to fabricate a multilayered quartz template for UV nanoimprint lithography (UV-NIL). The multilayered quartz template is fabricated by bonding a square piece of a standard quartz wafer, which is about 625 µm in thickness, to a wet-etched 6.35 mm thick quartz photomask plate. A fabricated multilayered template is loaded to the commercial UV-NIL tool Imprio(TM) 100, and NIL was performed successfully. The developed direct bonding technique makes it possible for standard quartz wafers, which are compatible with high-resolution semiconductor fabrication processes, to be utilized as the templates in commercial UV-NIL machines with enhanced mechanical stability.

Prevention of the adverse photic effects of peripheral light-focusing using UV-blocking contact lenses.

Science.gov (United States)

Kwok, L Stephen; Kuznetsov, Valerian A; Ho, Arthur; Coroneo, Minas T

2003-04-01

Peripheral light-focusing (PLF) is an occult form of ultraviolet radiation (UVR) hazardous to the human eye. In PLF, obliquely incident light is refracted from the peripheral cornea to concentrated sites inside the anterior segment. In the current study, the directionality of this phenomenon for UVR and whether PLF is established in outdoor settings exposed to sunlight were investigated. The protection provided by a UV-blocking contact lens was also evaluated. UVA and UVB sensors were placed on the nasal limbus of an anatomically based model eye. The temporal limbus was exposed to a UV light source placed at various angles behind the frontal plane. PLF was quantified with the sensor output. The ensemble was mounted in the orbit of a mannequin head and exposed to sunlight in three insolation environments within the region of Sydney, Australia. PLF for UVA and UVB was determined with no eyewear or with sunglasses and commercially available soft contact lenses, with and without UV-blocking capability. The intensity of UVA peaked at approximately 120 degrees incidence, the level at which the UVB response was also at its maximum. The intensification of UVA was up to x18.3. The intensity of PLF for UVA and UVB was reduced by an order of magnitude by a UV-blocking contact lens, whereas a clear contact lenses had a much lesser effect. Only the UV-blocking contact lens achieved a significant effect on UVA and UVB irradiance in the urban, beach, and mountain locales (P UV-blocking soft contact lenses. Sunglasses may be unable to shield oblique rays, unless side protection is incorporated. Contact lenses can offer UVR protection against all angles of incidence, including the peak-response angle. They can also protect the eye in settings in which the wearing of sunglasses is not feasible or convenient.

Nano-Imprint Lithography: Nanonex NX-2000

Data.gov (United States)

Federal Laboratory Consortium — Description:CORAL Name: NanoimprinterThis tool creates a pattern in a thin resist by embossing from a mold. The pattern is later transferred to the wafer by reactive...

Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography

Science.gov (United States)

Youn, Sung-Won; Suzuki, Kenta; Hiroshima, Hiroshi

2018-06-01

A software program for modifying a mold design to obtain a uniform residual layer thickness (RLT) distribution has been developed and its validity was verified by UV-nanoimprint lithography (UV-NIL) simulation. First, the effects of granularity (G) on both residual layer uniformity and filling characteristics were characterized. For a constant complementary pattern depth and a granularity that was sufficiently larger than the minimum pattern width, filling time decreased with the decrease in granularity. For a pattern design with a wide density range and an irregular distribution, the choice of a small granularity was not always a good strategy since the etching depth required for a complementary pattern occasionally exceptionally increased with the decrease in granularity. On basis of the results obtained, the automated method was applied to a chip-scale pattern modification. Simulation results showed a marked improvement in residual layer thickness uniformity for a capacity-equalized (CE) mold. For the given conditions, the standard deviation of RLT decreased in the range from 1/3 to 1/5 in accordance with pattern designs.

Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

KAUST Repository

Lee, Daeho

2012-08-10

Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.

Experiments towards establishing of design rules for R2R-UV-NIL with polymer working shims

Science.gov (United States)

Nees, Dieter; Ruttloff, Stephan; Palfinger, Ursula; Stadlober, Barbara

2016-03-01

Roll-to-Roll-UV-nanoimprint lithography (R2R-UV-NIL) enables high resolution large area patterning of flexible substrates and is therefore of increasing industrial interest. We have set up a custom-made R2R-UV-NIL pilot machine which is able to convert 10 inch wide web with velocities of up to 30 m/min. In addition, we have developed self-replicable UV-curable resins with tunable surface energy and Young's modulus for UV-imprint material as well as for polymer working stamp/shim manufacturing. Now we have designed test patterns for the evaluation of the impact of structure shape, critical dimension, pitch, depth, side wall angle and orientation relative to the web movement onto the imprint fidelity and working shim life time. We have used female (recessed structures) silicon masters of that design with critical dimensions between CD = 200 nm and 1600 nm, and structure depths of d = 500 nm and 1000 nm - all with vertical as well as inclined side walls. These entire master patterns have been transferred onto single male (protruding structures) R2R polymer working shims. The polymer working shims have been used for R2R-UV-NIL runs of several hundred meters and the imprint fidelity and process stability of the various test patterns have been compared. This study is intended as a first step towards establishing of design rules and developing of nanoimprint proximity correction strategies for industrial R2R-UV-NIL processes using polymer working shims.

Polymer nanoimprinting using an anodized aluminum mold for structural coloration

Science.gov (United States)

Kikuchi, Tatsuya; Nishinaga, Osamu; Natsui, Shungo; Suzuki, Ryosuke O.

2015-06-01

Polymer nanoimprinting of submicrometer-scale dimple arrays with structural coloration was demonstrated. Highly ordered aluminum dimple arrays measuring 530-670 nm in diameter were formed on an aluminum substrate via etidronic acid anodizing at 210-270 V and subsequent anodic oxide dissolution. The nanostructured aluminum surface led to bright structural coloration with a rainbow spectrum, and the reflected wavelength strongly depends on the angle of the specimen and the period of the dimple array. The reflection peak shifts gradually with the dimple diameter toward longer wavelength, reaching 800 nm in wavelength at 670 nm in diameter. The shape of the aluminum dimple arrays were successfully transferred to a mercapto-ester ultra-violet curable polymer via self-assembled monolayer coating and polymer replications using a nanoimprinting technique. The nanostructured polymer surfaces with positively and negatively shaped dimple arrays also exhibited structural coloration based on the periodic nanostructure, and reflected light mostly in the visible region, 400-800 nm. This nanostructuring with structural coloration can be easily realized by simple techniques such as anodizing, SAM coating, and nanoimprinting.

UV-vis light transmittance through tinted contact lenses and the effect of color on values.

Science.gov (United States)

Osuagwu, Uchechukwu L; Ogbuehi, Kelechi C

2014-06-01

To assess the transmittance, in the 200-700nm electromagnetic radiation spectrum, by popularly used tinted soft contact lenses (CLs). The spectra transmittances of ultraviolet (UV)-blocking (I Day Acuvue Define, Freshlook ONE DAY) and non-UV-blocking (Durasoft 3, Tutti, and NeoCosmo) tinted soft CLs were tested. The transmittance of each lens, including nine different colors of Freshlook CL was recorded on spectrophotometer, and the data used to also calculate a UV protection factor (PF) for each lens brand tested, with a higher value indicating a higher level of protection. The UV-blocking CLs significantly reduced UVC, UVB & UVA transmission and thereby meet the American National Standards Institution standard for class 2 UV blockers: a maximum of 30% transmittance of UVA and 5% transmittance of UVB wavelengths. In contrast, the Durasoft 3, Tutti, and NeoCosmo CLs demonstrated negligible UV-blockage. The Acuvue Define CL offered the greatest protection from UVC (PF=69) and UVB (PF=55), but with only 35% luminous transmittance, while the Freshlook CL (especially gemstone green) offered the best protection from UVA (PF=24) and showed about 55% translucency. Overall, the UV-blocking CLs performed equally well across the UV spectrum. Different colors of Freshlook CL transmitted statistically and clinically significantly different amounts of visible light but similar amounts of UVR. Freshlook and Acuvue Define CLs which are designated as UV-blockers significantly reduced UVR transmission to safe levels whereas Tutti, NeoCosmo and Durasoft 3 did not. Transmission within the Freshlook CL family was more dependent on color in the visible light spectrum, but not in the UV-spectrum, where the gemstone green performing best among the tested colors. Copyright © 2013 British Contact Lens Association. Published by Elsevier Ltd. All rights reserved.

V-groove plasmonic waveguides fabricated by nanoimprint lithography

DEFF Research Database (Denmark)

Fernandez-Cuesta, I.; Nielsen, R.B.; Boltasseva, Alexandra

2007-01-01

Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integra...... of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput. © 2007 American Vacuum Society......Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication...

3D Simulation of Nano-Imprint Lithography

DEFF Research Database (Denmark)

Román Marín, José Manuel; Rasmussen, Henrik K.; Hassager, Ole

2010-01-01

A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have...

Optical characterisation of photonic wire and photonic crystal waveguides fabricated using nanoimprint lithography

DEFF Research Database (Denmark)

Borel, Peter Ingo; Frandsen, Lars Hagedorn; Lavrinenko, Andrei

2006-01-01

We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography.......We have characterised photonic-crystal and photonic-wire waveguides fabricated by thermal nanoimprint lithography. The structures, with feature sizes down below 20 nm, are benchmarked against similar structures defined by direct electron beam lithography....

Effect of nano-imprinting on open-circuit voltage of organic solar cells

Energy Technology Data Exchange (ETDEWEB)

Emah, J.B.; Curry, R.J.; Silva, S.R.P. [Surrey Univ., Guildford (United Kingdom). Advanced Technology Inst.

2010-07-01

The open-circuit voltage (V{sub oc}) of solar cells with non-Ohmic contacts are determined by the work function difference of the electrodes. For Ohmic contacts the V{sub oc} is governed by the LUMO and HOMO levels of the acceptor and donor, respectively, which pin the Fermi levels of the cathode and anode. We present a case where the V{sub oc} of a single layer device using poly (3-hexylthiopene-2,5-diyl) (P3HT) as the photoactive material between a nanoimprinted poly poly (3,4-ethylenedioxythiophene) poly (styrene sulfonate)(PEDOT:PSS) and Al electrode decreases due to patterning. The reverse is shown to be the case when [6,6]-phenyl-C{sub 61}-butyric acid ester (PCBM) is introduced to form a bulk heterojunction (BHJ). In both scenarios, there is an increase in the short-circuit current, attributed to an extended optical path length within the photoactive layer and enhanced charge extraction through the increased surface area. The patterned BHJ devices show a 28% and 40% increase in the power conversion efficiency when imprinted with 727 nm and 340 nm periodic patterns respectively. ATR-FTIR investigations of the interfacial PEDOT:PSS film following patterning reveals the presence of PDMS residue which is supported by consideration of the effect on single layer P3HT and P3HT:PCBM blend device performance. UPS measurements demonstrate a reduction in the work function of the interfacial PEDOT:OSS layer by {proportional_to}0.5 eV following nanoimprinting which may originate from chemical modification by the PDMS residue or interfacial dipole formation. XPS spectrum of the imprinted PEDOT:PSS also shows a chemical shift in the 0(1s) core-level towards higher binding energy signifying interaction of the PDMS stamp residue with the PSS dominated surface of PEDOT:PSS. This led to significant improvement in the V{sub oc} and ultimately, the PCE. (orig.)

Nanoimprint lithography for microfluidics manufacturing

Science.gov (United States)

Kreindl, Gerald; Matthias, Thorsten

2013-12-01

The history of imprint technology as lithography method for pattern replication can be traced back to 1970's but the most significant progress has been made by the research group of S. Chou in the 1990's. Since then, it has become a popular technique with a rapidly growing interest from both research and industrial sides and a variety of new approaches have been proposed along the mainstream scientific advances. Nanoimprint lithography (NIL) is a novel method for the fabrication of micro/nanometer scale patterns with low cost, high throughput and high resolution. Unlike traditional optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional lithographic techniques. The ability to fabricate structures from the micro- to the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of micro- and nanotechnology and the biotech- sciences as a whole and will be discussed in this paper. Nanoimprinting can not only create resist patterns, as in lithography, but can also imprint functional device structures in various polymers, which can lead to a wide range of applications in electronics, photonics, data storage, and biotechnology.

Cones fabricated by 3D nanoimprint lithography for highly sensitive surface enhanced Raman spectroscopy

International Nuclear Information System (INIS)

Wu Wei; Hu Min; Ou Fungsuong; Li Zhiyong; Williams, R Stanley

2010-01-01

We demonstrated a cost-effective and deterministic method of patterning 3D cone arrays over a large area by using nanoimprint lithography (NIL). Cones with tip radius of less than 10 nm were successfully duplicated onto the UV-curable imprint resist materials from the silicon cone templates. Such cone structures were shown to be a versatile platform for developing reliable, highly sensitive surface enhanced Raman spectroscopy (SERS) substrates. In contrast to the silicon nanocones, the SERS substrates based on the Au coated cones made by the NIL offered significant improvement of the SERS signal. A further improvement of the SERS signal was observed when the polymer cones were imprinted onto a reflective metallic mirror surface. A sub-zeptomole detection sensitivity for a model molecule, trans-1,2-bis(4-pyridyl)-ethylene (BPE), on the Au coated NIL cone surfaces was achieved.

Fluid management in roll-to-roll nanoimprint lithography

Science.gov (United States)

Jain, A.; Bonnecaze, R. T.

2013-06-01

The key process parameters of UV roll-to-roll nanoimprint lithography are identified from an analysis of the fluid, curing, and peeling dynamics. The process includes merging of droplets of imprint material, curing of the imprint material from a viscous liquid to elastic solid resist, and pattern replication and detachment of the resist from template. The time and distances on the web or rigid substrate over which these processes occur are determined as function of the physical properties of the uncured liquid, the cured solid, and the roller configuration. The upper convected Maxwell equation is used to model the viscoelastic liquid and to calculate the force on the substrate and the torque on the roller. The available exposure time is found to be the rate limiting parameter and it is O(√Rho /uo), where R is the radius of the roller, ho is minimum gap between the roller and web, and uo is the velocity of the web. The residual layer thickness of the resist should be larger than the gap between the roller and the substrate to ensure complete feature filling and optimal pattern replication. For lower residual layer thickness, the droplets may not merge to form a continuous film for pattern transfer.

Improving information density in ferroelectric polymer films by using nanoimprinted gratings

Science.gov (United States)

Martínez-Tong, Daniel E.; Soccio, Michela; Rueda, Daniel R.; Nogales, Aurora; García-Gutiérrez, Mari Cruz; Ezquerra, Tiberio A.

2015-03-01

The development of polymer non-volatile memories depends on the effective fabrication of devices with high density of information. Well-defined low aspect ratio nanogratings on thin films of poly(vinylidene fluoride-trifluoroethylene) copolymers can be fabricated by using Nanoimprint Lithography (NIL). By using these nanogratings, an improved management of writing and reading information can be reached as revealed by Piezoresponse Force Microscopy (PFM). Structural investigation by means of Grazing Incidence X-ray (GIX) scattering techniques indicates that the physical confinement generated by nanoimprint promotes the development of smaller and edge-on oriented crystals. Our results evidence that one-dimensional nanostructuring can be a straightforward approach to improve the control of the polarization in ferroelectric polymer thin films.

The fabrication of nanopatterns with Au nanoparticles-embedded micelles via nanoimprint lithography

Energy Technology Data Exchange (ETDEWEB)

Lee, Jung-Pil; Kim, Eun-Uk; Koh, Haeng-Deog; Kang, Nam-Goo; Jung, Gun-Young; Lee, Jae-Suk, E-mail: gyjung@gist.ac.k, E-mail: jslee@gist.ac.k [Department of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro (Oryong-dong), Buk-gu Gwangju 500-712 (Korea, Republic of)

2009-09-09

We fabricated nanopatterns with Au nanoparticles-embedded micelles (Au-micelles) by self-assembly of block copolymers via nanoimprint lithography. The micelle structure prepared by self-assembled block copolymers was used as a template for the synthesis of Au nanoparticles (Au NPs). Au NPs were synthesized in situ inside the micelles of polystyrene-block-poly(2-vinylpyridine) (PS- b-P2VP). Au-micelles were arranged on the trenches of the polymer template, which was imprinted by nanoimprint lithography. The fabrication of line-type and dot-type nanopatterns was carried out by the combined method. In addition, multilayer nanopatterns of the Au-micelles were also proposed.

Fabrication of nanoparticle and protein nanostructures using nanoimprint lithography

NARCIS (Netherlands)

Maury, P.A.

2007-01-01

Nanoimprint lithography (NIL) was used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The resulting polymer template behaved as a physical barrier preventing the formation of a SAM in the covered

Generic nano-imprint process for fabrication of nanowire arrays

NARCIS (Netherlands)

Pierret, A.; Hocevar, M.; Diedenhofen, S.L.; Algra, R.E.; Vlieg, E.; Timmering, E.C.; Verschuuren, M.A.; Immink, W.G.G.; Verheijen, M.A.; Bakkers, E.P.A.M.

2010-01-01

A generic process has been developed to grow nearly defect-free arrays of (heterostructured) InP and GaP nanowires. Soft nano-imprint lithography has been used to pattern gold particle arrays on full 2inch substrates. After lift-off organic residues remain on the surface, which induce the growth of

Optimization of droplets for UV-NIL using coarse-grain simulation of resist flow

Science.gov (United States)

Sirotkin, Vadim; Svintsov, Alexander; Zaitsev, Sergey

2009-03-01

A mathematical model and numerical method are described, which make it possible to simulate ultraviolet ("step and flash") nanoimprint lithography (UV-NIL) process adequately even using standard Personal Computers. The model is derived from 3D Navier-Stokes equations with the understanding that the resist motion is largely directed along the substrate surface and characterized by ultra-low values of the Reynolds number. By the numerical approximation of the model, a special finite difference method is applied (a coarse-grain method). A coarse-grain modeling tool for detailed analysis of resist spreading in UV-NIL at the structure-scale level is tested. The obtained results demonstrate the high ability of the tool to calculate optimal dispensing for given stamp design and process parameters. This dispensing provides uniform filled areas and a homogeneous residual layer thickness in UV-NIL.

Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography

International Nuclear Information System (INIS)

Song, Jingfeng; Lu, Haidong; Gruverman, Alexei; Ducharme, Stephen; Li, Shumin; Tan, Li

2016-01-01

Conventional nanoimprint lithography with expensive rigid molds is used to pattern ferroelectric polymer nanostructures on hard substrate for use in, e.g., organic electronics. The main innovation here is the use of inexpensive soft polycarbonate molds derived from recordable DVDs and reverse nanoimprint lithography at low pressure, which is compatible with flexible substrates. This approach was implemented to produce regular stripe arrays with a spacing of 700 nm from vinylidene fluoride co trifluoroethylene ferroelectric copolymer on flexible polyethylene terephthalate substrates. The nanostructures have very stable and switchable piezoelectric response and good crystallinity, and are highly promising for use in organic electronics enhanced or complemented by the unique properties of the ferroelectric polymer, such as bistable polarization, piezoelectric response, pyroelectric response, or electrocaloric function. The soft-mold reverse nanoimprint lithography also leaves little or no residual layer, affording good isolation of the nanostructures. This approach reduces the cost and facilitates large-area, high-throughput production of isolated functional polymer nanostructures on flexible substrates for the increasing application of ferroelectric polymers in flexible electronics. (paper)

Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography.

Science.gov (United States)

Song, Jingfeng; Lu, Haidong; Li, Shumin; Tan, Li; Gruverman, Alexei; Ducharme, Stephen

2016-01-08

Conventional nanoimprint lithography with expensive rigid molds is used to pattern ferroelectric polymer nanostructures on hard substrate for use in, e.g., organic electronics. The main innovation here is the use of inexpensive soft polycarbonate molds derived from recordable DVDs and reverse nanoimprint lithography at low pressure, which is compatible with flexible substrates. This approach was implemented to produce regular stripe arrays with a spacing of 700 nm from vinylidene fluoride co trifluoroethylene ferroelectric copolymer on flexible polyethylene terephthalate substrates. The nanostructures have very stable and switchable piezoelectric response and good crystallinity, and are highly promising for use in organic electronics enhanced or complemented by the unique properties of the ferroelectric polymer, such as bistable polarization, piezoelectric response, pyroelectric response, or electrocaloric function. The soft-mold reverse nanoimprint lithography also leaves little or no residual layer, affording good isolation of the nanostructures. This approach reduces the cost and facilitates large-area, high-throughput production of isolated functional polymer nanostructures on flexible substrates for the increasing application of ferroelectric polymers in flexible electronics.

Functional patterns obtained by nanoimprinting lithography and subsequent growth of polymer brushes

International Nuclear Information System (INIS)

Genua, A; AlduncIn, J A; Pomposo, J A; Grande, H; Kehagias, N; Reboud, V; Sotomayor, C; Mondragon, I; Mecerreyes, D

2007-01-01

In this work the growth of polymer brushes was combined with nanoimprint lithography (NIL) in order to obtain new functional nanopatterns. First, a functional thermoplastic methacrylic copolymer poly(methyl methacrylate-co-2-bromoisobutyryl-oxy-ethyl methacrylate) was synthesized. This copolymer was successfully patterned by NIL using a silicon stamp at 160 deg. C and 60 bar. Next, hydrophilic polymer brushes based on poly(3-sulfopropylmethacrylate) and hydrophobic polymer brushes based on a poly(fluorinated methacrylate) were grown on the imprinted surfaces. The surface properties of the patterned polymer were accordingly modified and, as a consequence, the water contact angle was modified from 80.3 deg. to 32.5 deg. in the case of the hydrophilic brushes and to 118.1 deg. in the case of the hydrophobic brushes. As an application we demonstrated the use of hydrophobic polymer brushes in order to modify the surface of polymeric stamps for NIL with self-demoulding properties

Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures

Energy Technology Data Exchange (ETDEWEB)

Chen, Xiuguo; Ma, Zhichao; Xu, Zhimou [Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhang, Chuanwei; Jiang, Hao [State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China); Liu, Shiyuan, E-mail: shyliu@mail.hust.edu.cn [Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074 (China); State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074 (China)

2014-11-21

Mueller matrix ellipsometry (MME) is applied to detect foot-like asymmetry encountered in nanoimprint lithography (NIL) processes. We present both theoretical and experimental results which show that MME has good sensitivity to both the magnitude and direction of asymmetric profiles. The physics behind the use of MME for asymmetry detection is the breaking of electromagnetic reciprocity theorem for the zeroth-order diffraction of asymmetric gratings. We demonstrate that accurate characterization of asymmetric nanoimprinted gratings can be achieved by performing MME measurements in a conical mounting with the plane of incidence parallel to grating lines and meanwhile incorporating depolarization effects into the optical model. The comparison of MME-extracted asymmetric profile with the measurement by cross-sectional scanning electron microscopy also reveals the strong potential of this technique for in-line monitoring NIL processes, where symmetric structures are desired.

Fast thermal nanoimprint lithography by a stamp with integrated heater

DEFF Research Database (Denmark)

Tormen, Massimo; Malureanu, Radu; Pedersen, Rasmus Haugstrup

2008-01-01

We propose fast nanoimprinting lithography (NIL) process based on the use of stamps with integrated heater. The latter consists of heavily ion implantation n-type doped silicon layer buried below the microstructured surface of the stamp. The stamp is heated by Joule effect, by 50 μs 25 Hz...

Effect of surface tension and coefficient of thermal expansion in 30 nm scale nanoimprinting with two flexible polymer molds

International Nuclear Information System (INIS)

Kim, Jae Kwan; Cho, Hye Sung; Jung, Ho-Sup; Suh, Kahp-Yang; Lim, Kipil; Kim, Ki-Bum; Choi, Dae-Geun; Jeong, Jun-Ho

2012-01-01

We report on nanoimprinting of polymer thin films at 30 nm scale resolution using two types of ultraviolet (UV)-curable, flexible polymer molds: perfluoropolyether (PFPE) and polyurethane acrylate (PUA). It was found that the quality of nanopatterning at the 30 nm scale is largely determined by the combined effects of surface tension and the coefficient of thermal expansion of the polymer mold. In particular, the polar component of surface tension may play a critical role in clean release of the mold, as evidenced by much reduced delamination or broken structures for the less polarized PFPE mold when patterning a relatively hydrophilic PMMA film. In contrast, such problems were not notably observed with a relatively hydrophobic PS film for both polymer molds. In addition, the demolding characteristic was also influenced by the coefficient of thermal expansion so that no delamination or uniformity problems were observed when patterning a UV-curable polymer film at room temperature. These results suggest that a proper polymeric mold material needs to be chosen for patterning polymer films under different surface properties and processing conditions, providing insights into how a clean demolding characteristic can be obtained at 30 nm scale nanopatterning. (paper)

Toward a nanoimprinted nanoantenna to perform optical rectification through molecular diodes

Science.gov (United States)

Reynaud, C. A.; Duché, D.; Ruiz, C. M.; Palanchoke, U.; Patrone, L.; Le Rouzo, J.; Labau, S.; Frolet, N.; Gourgon, C.; Alfonso, C.; Charaï, A.; Lebouin, C.; Simon, J.-J.; Escoubas, L.

2017-12-01

This work presents investigations about the realization and modelization of rectenna solar cells. Rectennas are antennas coupled with a rectifier to convert the alternative current originating from the antenna into direct current that can be harvested and stored. By reducing the size of the antennas to the nanoscale, interactions with visible and near-infrared light become possible. If techniques such as nanoimprint lithography make possible the fabrication of sufficiently small plasmonic structures to act as optical antennas, the concept of rectenna still faces several challenges. One of the most critical point is to achieve rectification at optical frequencies. To address this matter, we propose to use molecular diodes (ferrocenyl-alkanethiol) that can be self-assembled on metallic surfaces such as gold or silver. In this paper, we present a basic rectenna theory as well as finite-difference time-domain (FDTD) optical simulations of plasmonic structures and experimental results of both nanoimprint fabrication of samples and characterizations by electron microscopy, Raman spectroscopy, and cyclic voltammetry techniques.

Fabrication of biopolymer cantilevers using nanoimprint lithography

DEFF Research Database (Denmark)

Keller, Stephan Sylvest; Feidenhans'l, Nikolaj Agentoft; Fisker-Bødker, Nis

2011-01-01

The biodegradable polymer poly(l-lactide) (PLLA) was introduced for the fabrication of micromechanical devices. For this purpose, thin biopolymer films with thickness around 10 μm were spin-coated on silicon substrates. Patterning of microcantilevers is achieved by nanoimprint lithography. A major...... challenge was the high adhesion between PLLA and silicon stamp. Optimized stamp fabrication and the deposition of a 125 nm thick fluorocarbon anti-stiction coating on the PLLA allowed the fabrication of biopolymer cantilevers. Resonance frequency measurements were used to estimate the Young’s modulus...

Self-aligned metallization on organic semiconductor through 3D dual-layer thermal nanoimprint

International Nuclear Information System (INIS)

Jung, Y; Cheng, X

2014-01-01

High-resolution patterning of metal structures on organic semiconductors is important to the realization of high-performance organic transistors for organic integrated circuit applications. The traditional shadow mask technique has a limited resolution, precluding sub-micron metal structures on organic semiconductors. Thus organic transistors cannot benefit from scaling into the deep sub-micron region to improve their dc and ac performances. In this work, we report an efficient multiple-level metallization on poly (3-hexylthiophene) (P3HT) with a deep sub-micron lateral gap. By using a 3D nanoimprint mold in a dual-layer thermal nanoimprint process, we achieved self-aligned two-level metallization on P3HT. The 3D dual-layer thermal nanoimprint enables the first metal patterns to have suspending side-wings that can clearly define a distance from the second metal patterns. Isotropic and anisotropic side-wing structures can be fabricated through two different schemes. The process based on isotropic side-wings achieves a lateral-gap in the order of 100 nm (scheme 1). A gap of 60 nm can be achieved from the process with anisotropic side-wings (scheme 2). Because of the capability of nanoscale metal patterning on organic semiconductors with high overlay accuracy, this self-aligned metallization technique can be utilized to fabricate high-performance organic metal semiconductor field-effect transistor. (paper)

Silicon oxide nanoimprint stamp fabrication by edge lithography reinforced with silicon nitride

NARCIS (Netherlands)

Zhao, Yiping; Berenschot, Johan W.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt

2007-01-01

The fabrication of silicon oxide nanoimprint stamp employing edge lithography in combination with silicon nitride deposition is presented. The fabrication process is based on conventional photolithography an weg etching methods. Nanoridges with width dimension of sub-20 nm were fabricated by edge

Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching

KAUST Repository

Yabiku, Y.

2013-10-22

We applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns. 2013 Author(s).

Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching

Directory of Open Access Journals (Sweden)

Yu Yabiku

2013-10-01

Full Text Available We applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns.

Large area nanoimprint by substrate conformal imprint lithography (SCIL)

Science.gov (United States)

Verschuuren, Marc A.; Megens, Mischa; Ni, Yongfeng; van Sprang, Hans; Polman, Albert

2017-06-01

Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm2 to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3-4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.

Nanoimprint lithography of light trapping patterns in sol-gel coatings for thin film silicon solar cells

Energy Technology Data Exchange (ETDEWEB)

Heijna, M.; Loffler, J.; Van Aken, B.B.; Soppe, W.J. [ECN Solar Energy, Petten (Netherlands); Borg, H.; Peeters, P. [OM and T, Eindhoven (Netherlands)

2008-04-15

For thin-film silicon solar cells, light trapping schemes are of uppermost importance to harvest all available sunlight. Typically, randomly textured TCO front layers are used to scatter the light diffusively in p-i-n cells on glass. Here, we investigate methods to texture the back contact with both random and periodic textures, for use in n-i-p cells on opaque foil. We applied an electrically insulating SiOx-polymer coating on a stainless steel substrate, and textured this barrier layer by nanoimprint. On this barrier layer the back contact is deposited for further use in the solar cell stack. Replication of masters with various random and periodic patterns was tested, and, using scanning electron microscopy, replicas were found to compare well with the originals. Masters with U-grooves of various sub micrometer widths have been used to investigate the optimal dimensions of regular patterns for light trapping in the silicon layers. Angular reflection distributions were measured to evaluate the light scattering properties of both periodic and random patterns. Diffraction gratings show promising results in scattering the light to specific angles, enhancing the total internal reflection in the solar cell.

Nanoimprint technology nanotransfer for thermoplastic and photocurable polymers

CERN Document Server

Taniguchi, Jun; Mizuno, Jun; Saito, Takushi

2013-01-01

Nanoscale pattern transfer technology using molds is a rapidly advancing area and one that has seen much recent attention due to its potential for use in nanotechnology industries and applications. However, because of these rapid advances, it can be difficult to keep up with the technological trends and the latest cutting-edge methods. In order to fully understand these pioneering technologies, a comprehensive understanding of the basic science and an overview of the techniques are required. Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers covers

Physically transient photonics: random versus distributed feedback lasing based on nanoimprinted DNA.

Science.gov (United States)

Camposeo, Andrea; Del Carro, Pompilio; Persano, Luana; Cyprych, Konrad; Szukalski, Adam; Sznitko, Lech; Mysliwiec, Jaroslaw; Pisignano, Dario

2014-10-28

Room-temperature nanoimprinted, DNA-based distributed feedback (DFB) laser operation at 605 nm is reported. The laser is made of a pure DNA host matrix doped with gain dyes. At high excitation densities, the emission of the untextured dye-doped DNA films is characterized by a broad emission peak with an overall line width of 12 nm and superimposed narrow peaks, characteristic of random lasing. Moreover, direct patterning of the DNA films is demonstrated with a resolution down to 100 nm, enabling the realization of both surface-emitting and edge-emitting DFB lasers with a typical line width of <0.3 nm. The resulting emission is polarized, with a ratio between the TE- and TM-polarized intensities exceeding 30. In addition, the nanopatterned devices dissolve in water within less than 2 min. These results demonstrate the possibility of realizing various physically transient nanophotonics and laser architectures, including random lasing and nanoimprinted devices, based on natural biopolymers.

Direct nanoimprint lithography of Al2O3 using a chelated monomer-based precursor

International Nuclear Information System (INIS)

Ganesan, Ramakrishnan; Dinachali, Saman Safari; Lim, Su Hui; Saifullah, M S M; He, Chaobin; Low, Hong Yee; Chong, Wee Tit; Lim, Andrew H H; Yong, Jin Jie; Thian, Eng San

2012-01-01

Nanostructuring of Al 2 O 3 is predominantly achieved by the anodization of aluminum film and is limited to obtaining porous anodized aluminum oxide (AAO). One of the main restrictions in developing approaches for direct fabrication of various types of Al 2 O 3 patterns, such as lines, pillars, holes, etc, is the lack of a processable aluminum-containing resist. In this paper, we demonstrate a stable precursor prepared by reacting aluminum tri-sec-butoxide with 2-(methacryloyloxy)ethyl acetoacetate, a chelating monomer, which can be used for large area direct nanoimprint lithography of Al 2 O 3 . Chelation in the precursor makes it stable against hydrolysis whilst the presence of a reactive methacrylate group renders it polymerizable. The precursor was mixed with a cross-linker and their in situ thermal free-radical co-polymerization during nanoimprinting rigidly shaped the patterns, trapped the metal atoms, reduced the surface energy and strengthened the structures, thereby giving a ∼100% yield after demolding. The imprinted structures were heat-treated, leading to the loss of organics and their subsequent shrinkage. Amorphous Al 2 O 3 patterns with line-widths as small as 17 nm were obtained. Our process utilizes the advantages of sol–gel and methacrylate routes for imprinting and at the same time alleviates the disadvantages associated with both these methods. With these benefits, the chelating monomer route may be the harbinger of the universal scheme for direct nanoimprinting of metal oxides. (paper)

Multi-Periodic Photonic Crystal Out-Coupling Layers for Flexible OLEDs

DEFF Research Database (Denmark)

Kluge, Christian; Pradana, Arfat; Adam, Jost

2014-01-01

Waveguide mode extraction with multi-periodic photonic crystals is studied in experiment and finite-difference time-domain (FDTD) simulations. Flexible nanostructured organic light-emitting diodes (OLEDs) are fabricated by UV nanoimprint lithography.......Waveguide mode extraction with multi-periodic photonic crystals is studied in experiment and finite-difference time-domain (FDTD) simulations. Flexible nanostructured organic light-emitting diodes (OLEDs) are fabricated by UV nanoimprint lithography....

Flexible palladium-based H2 sensor with fast response and low leakage detection by nanoimprint lithography.

Science.gov (United States)

Lim, Su Hui; Radha, Boya; Chan, Jie Yong; Saifullah, Mohammad S M; Kulkarni, Giridhar U; Ho, Ghim Wei

2013-08-14

Flexible palladium-based H2 sensors have a great potential in advanced sensing applications, as they offer advantages such as light weight, space conservation, and mechanical durability. Despite these advantages, the paucity of such sensors is due to the fact that they are difficult to fabricate while maintaining excellent sensing performance. Here, we demonstrate, using direct nanoimprint lithography of palladium, the fabrication of a flexible, durable, and fast responsive H2 sensor that is capable of detecting H2 gas concentration as low as 50 ppm. High resolution and high throughput patterning of palladium gratings over a 2 cm × 1 cm area on a rigid substrate was achieved by heat-treating nanoimprinted palladium benzyl mercaptide at 250 °C for 1 h. The flexible and robust H2 sensing device was fabricated by subsequent transfer nanoimprinting of these gratings into a polycarbonate film at its glass transition temperature. This technique produces flexible H2 sensors with improved durability, sensitivity, and response time in comparison to palladium thin films. At ambient pressure and temperature, the device showed a fast response time of 18 s at a H2 concentration of 3500 ppm. At 50 ppm concentration, the response time was found to be 57 s. The flexibility of the sensor does not appear to compromise its performance.

Step-and-Repeat Nanoimprint-, Photo- and Laser Lithography from One Customised CNC Machine.

Science.gov (United States)

Greer, Andrew Im; Della-Rosa, Benoit; Khokhar, Ali Z; Gadegaard, Nikolaj

2016-12-01

The conversion of a computer numerical control machine into a nanoimprint step-and-repeat tool with additional laser- and photolithography capacity is documented here. All three processes, each demonstrated on a variety of photoresists, are performed successfully and analysed so as to enable the reader to relate their known lithography process(es) to the findings. Using the converted tool, 1 cm(2) of nanopattern may be exposed in 6 s, over 3300 times faster than the electron beam equivalent. Nanoimprint tools are commercially available, but these can cost around 1000 times more than this customised computer numerical control (CNC) machine. The converted equipment facilitates rapid production and large area micro- and nanoscale research on small grants, ultimately enabling faster and more diverse growth in this field of science. In comparison to commercial tools, this converted CNC also boasts capacity to handle larger substrates, temperature control and active force control, up to ten times more curing dose and compactness. Actual devices are fabricated using the machine including an expanded nanotopographic array and microfluidic PDMS Y-channel mixers.

Optimization of micro and nanoimprint de-embossing by elastic fracture modelling

OpenAIRE

Balla, Tobias; Spearing, Simon Mark

2013-01-01

A semi-analytical model is presented for the de-embossing phase of the nanoimprint patterning process. The model is based on established principles of elastic fracture mechanics as developed for fibre-bridged cracking in composites. De-embossing is idealized as a steady-state fracture process, which enables the energy change to be considered by reference to a unit cell of a cylindrical polymer post, de-embossing from an axisymmetric stamp. The model provides predictions of the achievable limi...

Fabrication and nano-imprintabilities of Zr-, Pd- and Cu-based glassy alloy thin films

International Nuclear Information System (INIS)

Takenaka, Kana; Saidoh, Noriko; Nishiyama, Nobuyuki; Inoue, Akihisa

2011-01-01

With the aim of investigating nano-imprintability of glassy alloys in a film form, Zr 49 Al 11 Ni 8 Cu 32 , Pd 39 Cu 29 Ni 13 P 19 and Cu 38 Zr 47 Al 9 Ag 6 glassy alloy thin films were fabricated on Si substrate by a magnetron sputtering method. These films exhibit a very smooth surface, a distinct glass transition phenomenon and a large supercooled liquid region of about 80 K, which are suitable for imprinting materials. Moreover, thermal nano-imprintability of these obtained films is demonstrated by using a dot array mold with a dot diameter of 90 nm. Surface observations revealed that periodic nano-hole arrays with a hole diameter of 90 nm were successfully imprinted on the surface of these films. Among them, Pd-based glassy alloy thin film indicated more precise pattern imprintability, namely, flatter residual surface plane and sharper hole edge. It is said that these glassy alloy thin films, especially Pd-based glassy alloy thin film, are one of the promising materials for fabricating micro-machines and nano-devices by thermal imprinting.

Investigation of GaN-based light emitting diodes with nano-hole patterned sapphire substrate (NHPSS) by nano-imprint lithography

International Nuclear Information System (INIS)

Huang, H.W.; Lin, C.H.; Huang, J.K.; Lee, K.Y.; Lin, C.F.; Yu, C.C.; Tsai, J.Y.; Hsueh, R.; Kuo, H.C.; Wang, S.C.

2009-01-01

In this paper, gallium-nitride (GaN)-based light-emitting diodes (LEDs) with nano-hole patterned sapphire (NHPSS) by nano-imprint lithography are fabricated and investigated. At an injection current of 20 mA, the LED with NHPSS increased the light output power of the InGaN/GaN multiple quantum well LEDs by a factor of 1.33, and the wall-plug efficiency is 30% higher at 20 mA indicating that the LED with NHPSS had larger light extraction efficiency. In addition, by examining the radiation patterns, the LED with NHPSS shows stronger light extraction with a wider view angle. These results offer promising potential to enhance the light output powers of commercial light-emitting devices using the technique of nano-imprint lithography.

Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography

NARCIS (Netherlands)

Zhao, Yiping; Berenschot, Johan W.; de Boer, M.; de Boer, Meint J.; Jansen, Henricus V.; Tas, Niels Roelof; Huskens, Jurriaan; Elwenspoek, Michael Curt

2008-01-01

The fabrication of a stamp reinforced with silicon nitride is presented for its use in nanoimprint lithography. The fabrication process is based on edge lithography using conventional optical lithography and wet anisotropic etching of 110 silicon wafers. SiO2 nano-ridges of 20 nm in width were

Resistless Fabrication of Nanoimprint Lithography (NIL Stamps Using Nano-Stencil Lithography

Directory of Open Access Journals (Sweden)

Juergen Brugger

2013-10-01

Full Text Available In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.

Fabrication of a cost-effective polymer nanograting as a disposable plasmonic biosensor using nanoimprint lithography

Science.gov (United States)

Mohapatra, Saswat; Kumari, Sudha; Moirangthem, Rakesh S.

2017-07-01

A simple and cost-effective flexible plasmonic sensor is developed using a gold-coated polymer nanograting structure prepared via soft UV nanoimprint lithography. The sub-wavelength nanograting patterns of digital versatile discs were used as a template to prepare the polydimethylsiloxane stamp. The plasmonic sensing substrate was achieved after coating a gold thin film on top of the imprinted nanograting sample. The surface plasmon resonance (SPR) modes excited on the gold-coated nanograting structure appeared as a dip in the reflectance spectrum measured at normal incidence under white light illumination in the ambient air medium. Electromagnetic simulation based on the finite element method was carried out to analyze the excited SPR modes. The simulated result shows very close agreement with the experimental data. The performance of the sensor with respect to changing the surrounding dielectric medium yields a bulk refractive index sensitivity of 788  ±  21 nm per refractive index unit. Further, label-free detection of proteins using a plasmonic sensing substrate was demonstrated by monitoring specific interactions between bovine serum albumin (BSA) and anti-BSA proteins, which gave a detection limit of 123 pg mm-2 with respect to target anti-BSA protein binding. Thus, our proposed plasmonic sensor has potential for the development of an economical and highly sensitive label-free optical biosensing device for biomedical applications.

Inclined nanoimprinting lithography for 3D nanopatterning

International Nuclear Information System (INIS)

Liu Zhan; Bucknall, David G; Allen, Mark G

2011-01-01

We report a non-conventional shear-force-driven nanofabrication approach, inclined nanoimprint lithography (INIL), for producing 3D nanostructures of varying heights on planar substrates in a single imprinting step. Such 3D nanostructures are fabricated by exploiting polymer anisotropic dewetting where the degree of anisotropy can be controlled by the magnitude of the inclination angle. The feature size is reduced from micron scale of the template to a resultant nanoscale pattern. The underlying INIL mechanism is investigated both experimentally and theoretically. The results indicate that the shear force generated at a non-zero inclination angle induced by the INIL apparatus essentially leads to asymmetry in the polymer flow direction ultimately resulting in 3D nanopatterns with different heights. INIL removes the requirements in conventional nanolithography of either utilizing 3D templates or using multiple lithographic steps. This technique enables various 3D nanoscale devices including angle-resolved photonic and plasmonic crystals to be fabricated.

Generic nano-imprint process for fabrication of nanowire arrays

Energy Technology Data Exchange (ETDEWEB)

Pierret, Aurelie; Hocevar, Moira; Algra, Rienk E; Timmering, Eugene C; Verschuuren, Marc A; Immink, George W G; Verheijen, Marcel A; Bakkers, Erik P A M [Philips Research Laboratories Eindhoven, High Tech Campus 11, 5656 AE Eindhoven (Netherlands); Diedenhofen, Silke L [FOM Institute for Atomic and Molecular Physics c/o Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven (Netherlands); Vlieg, E, E-mail: e.p.a.m.bakkers@tue.nl [IMM, Solid State Chemistry, Radboud University Nijmegen, Heyendaalseweg 135, 6525 AJ Nijmegen (Netherlands)

2010-02-10

A generic process has been developed to grow nearly defect-free arrays of (heterostructured) InP and GaP nanowires. Soft nano-imprint lithography has been used to pattern gold particle arrays on full 2 inch substrates. After lift-off organic residues remain on the surface, which induce the growth of additional undesired nanowires. We show that cleaning of the samples before growth with piranha solution in combination with a thermal anneal at 550 deg. C for InP and 700 deg. C for GaP results in uniform nanowire arrays with 1% variation in nanowire length, and without undesired extra nanowires. Our chemical cleaning procedure is applicable to other lithographic techniques such as e-beam lithography, and therefore represents a generic process.

Gaz Phase IR and UV Spectroscopy of Neutral Contact Ion Pairs

Science.gov (United States)

Habka, Sana; Brenner, Valerie; Mons, Michel; Gloaguen, Eric

2016-06-01

Cations and anions, in solution, tend to pair up forming ion pairs. They play a crucial role in many fundamental processes in ion-concentrated solutions and living organisms. Despite their importance and vast applications in physics, chemistry and biochemistry, they remain difficult to characterize namely because of the coexistence of several types of pairing in solution. However, an interesting alternative consists in applying highly selective gas phase spectroscopy which can offer new insights on these neutral ion pairs. Our study consists in characterizing contact ion pairs (CIPs) in isolated model systems (M+, Ph-(CH2)n-COO- with M=Li, Na, K, Rb, Cs, and n=1-3), to determine their spectral signatures and compare them to ion pairs in solution. We have used laser desorption to vaporize a solid tablet containing the desired salt. Structural information for each system was obtained by mass-selective, UV and IR laser spectroscopy combined with high level quantum chemistry calculations1. Evidence of the presence of neutral CIPs was found by scanning the π-π* transition of the phenyl ring using resonant two-photon ionization (R2PI). Then, conformational selective IR/UV double resonance spectra were recorded in the CO2- stretch region for each conformation detected. The good agreement between theoretical data obtained at the BSSE-corrected-fullCCSD(T)/dhf-TZVPP//B97-D3/dhf-TZVPP level and experimental IR spectra led us to assign the 3D structure for each ion pair formed. Spectral signatures of (M+, Ph-CH2-COO-) pairs, were assigned to a bidentate CIPs between the alkali cation and the carboxylate group. In the case of (Li+, Ph-(CH2)3-COO-) pairs, the presence of a flexible side chain promotes a cation-π interaction leading to a tridentate O-O-π structure with its unique IR and UV signatures. IR spectra obtained on isolated CIPs were found very much alike the ones published on lithium and sodium acetate in solution2. However, in the case of sodium acetate, solution

A compact system for large-area thermal nanoimprint lithography using smart stamps

DEFF Research Database (Denmark)

Pedersen, Rasmus Haugstrup; Hansen, Ole; Kristensen, Anders

2008-01-01

We present a simple apparatus for thermal nanoimprint lithography. In this work, the stamp is designed to significantly reduce the requirements for pressure application on the external imprint system. By MEMS-based processing, an air cavity inside the stamp is created, and the required pressure...... for successful imprint is reduced. Additionally, the stamp is capable of performing controlled demolding after imprint. Due to the complexity of the stamp, a compact and cost-effective imprint apparatus can be constructed. The design and fabrication of the advanced stamp as well as the simple imprint equipment...

Modeling and simulation of stamp deflections in nanoimprint lithography: Exploiting backside grooves to enhance residual layer thickness uniformity

DEFF Research Database (Denmark)

Taylor, Hayden; Smistrup, Kristian; Boning, Duane

2011-01-01

We describe a model for the compliance of a nanoimprint stamp etched with a grid of backside grooves. We integrate the model with a fast simulation technique that we have previously demonstrated, to show how etched grooves help reduce the systematic residual layer thickness (RLT) variations...

Evaluation of Combined Peracetic acid and UV treatment for ...

Science.gov (United States)

The current study evaluates the effectiveness of the combined application of Peracetic acid and ultraviolet radiation as alternative disinfectant agents to the traditional chlorination of wastewater effluents. Various pathogens (E. coli, enterococci and fecal coliforms) were evaluated in the study. Four experiments were conducted using low to high PAA levels and UV dosages. E. coli and enterococci were resistant to low to moderate PAA dosage (0.5- 1 mg/L). These microbes can be removed effectively at high PAA dosage (2.5 mg/L) with 30 min contact time. Fecal coliforms were completely inactivated even at a low PAA dose of 0.7 mg/L. E. coli was more susceptible to UV disinfection than enterococci at low UV dosages. Enterococci required at least 40 mJ/cm2 for 2.5 log inactivation. In combined PAA + UV treatment, low UV intensities between 7 – 40 mJ/cm2 showed poor disinfection performance at a low PAA concentration of 1.5 mg/L. High UV intensities of 120 and 60 mJ/cm2 inactivated all the pathogens to below detection levels even at low to moderate PAA (0.7 mg/L and 1 mg/L) pretreatment concentration. Combined PAA + UV treatment at 1 mg/L (for 15 and 30 min contact time) + 120 and 60 mJ/cm2 did not show any regrowth of microbes, whereas PAA only disinfection with 15 min contact time showed regrowth of enterococci and fecal coliforms. UV only disinfection showed E. coli regrowth. • This pilot scale study was designed for providing necessary parameter optimization

DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates

DEFF Research Database (Denmark)

Smistrup, K.; Nørregaard, J.; Mironov, A.

2013-01-01

by including a lambda quarter shift at the center of the grating. The need for phase shifts and multiple wavelengths eliminates some lithography methods such as holography. Typically, these lasers are produced by e-beam lithography (EBL). We present a production method based on thermal nanoimprint lithography...... during the imprint process and the narrow temperature window for imprint and separation (80°C and 55°C) ensures minimal issues with thermal mismatch between the InP substrate and the Si stamp. The imprinted InP wafers were processed in NeoPhotonics standard process line to create working lasers...

Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing

Science.gov (United States)

Matsuoka, Yoichi; Seki, Junichi; Nakayama, Takahiro; Nakagawa, Kazuki; Azuma, Hisanobu; Yamamoto, Kiyohito; Sato, Chiaki; Sakai, Fumio; Takabayashi, Yukio; Aghili, Ali; Mizuno, Makoto; Choi, Jin; Jones, Chris E.

2016-10-01

Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

Uniformity across 200 mm silicon wafers printed by nanoimprint lithography

International Nuclear Information System (INIS)

Gourgon, C; Perret, C; Tallal, J; Lazzarino, F; Landis, S; Joubert, O; Pelzer, R

2005-01-01

Uniformity of the printing process is one of the key parameters of nanoimprint lithography. This technique has to be extended to large size wafers to be useful for several industrial applications, and the uniformity of micro and nanostructures has to be guaranteed on large surfaces. This paper presents results of printing on 200 mm diameter wafers. The residual thickness uniformity after printing is demonstrated at the wafer scale in large patterns (100 μm), in smaller lines of 250 nm and in sub-100 nm features. We show that a mould deformation occurs during the printing process, and that this deformation is needed to guarantee printing uniformity. However, the mould deformation is also responsible for the potential degradation of the patterns

Der Effekt UV-blockierender Kontaktlinsen bei der Therapie der Keratitis superficialis chronica des Hundes

OpenAIRE

Denk, Nora

2009-01-01

Objective Canine chronic superficial keratitis (CSK) is chronic, progressive keratopathy, which is suspected to be caused by an immune mediated response triggered by ultraviolet light exposure. The purpose of this study was to evaluate the effect of UV-blocking soft contact lenses in treatment for CSK. Methods 26 dogs (26 eyes) with CSK were treated continuously with UV-blocking contact lenses (*Acri.Pat®-UV bandage lenses) for six months. A contact lens was placed on one eye of eac...

Allergic contact dermatitis to plastic banknotes.

Science.gov (United States)

Mohamed, M; Delaney, T A; Horton, J J

1999-08-01

Allergic contact dermatitis to ultraviolet (UV) cured acrylates occurs predominantly in occupationally exposed workers. Two men presented with dermatitis coinciding with the location of banknotes in their pockets. Patch testing confirmed allergic contact dermatitis to multiple acrylates and Australian plastic banknotes. This is the first report of contact allergy to acrylates present in Australian plastic banknotes.

Computational study of a high-temperature thermal nanoimprint lithographic (TNIL) process

Science.gov (United States)

Cleveland, Nicolas Joseph

As an emerging manufacturing technique, nanoimprint lithography (NIL) can fabricate micro and nanoscale features of microfluidic devices at very high accuracy and reliability. The process parameters such as pressure, temperature, and material properties play critical roles in the NIL process. In this work, the process of thermal nanoimprint lithography (TNIL) is studied computationally and the developed model can accurately predict the nano and micro-pattern geometry and quality from TNIL processes based on complex mold-resist interaction. Applications of this modeling technique range from micro- and nano-patterns used in micro-channels for biomedical devices to other applications such as biological/particle sensors or superhydrophobic surfaces. In high-temperature TNIL process, a polymer melt such as polymethyl-methacrylate (PMMA) is heated beyond the melting temperature so that it behaves predominantly as a fluid during the imprint process. The effects of surface tension and shear thinning become significant at or above the melting point, whereas the polymer melt can be modeled as a viscoelastic solid, solved with finite element analysis, when process temperature remains between the glass transition and melting temperatures. Additionally, the mold used in TNIL can deform since it is made of soft-rubbery elastomer such as polydimethylsiloxane (PDMS), and it is of interest to include the effect of subsequent mold deformation. Leakage between channels or significant variation in channel width can occur in micro-fluidic devices if mold deformation exceeds design tolerances. In the current work, fluid-structure interaction (FSI) technology is leveraged to solve for significant mold deformation and its effect on the polymer melt flow field during TNIL process. The simulation result is compared to experimental results. The FSI simulation result is also compared to the equivalent case with a rigid mold in place of flexible material, which shows results of differing mold

Highly uniform residual layers for arrays of 3D nanoimprinted cavities in Fabry-Pérot-filter-array-based nanospectrometers

Science.gov (United States)

Memon, Imran; Shen, Yannan; Khan, Abdullah; Woidt, Carsten; Hillmer, Hartmut

2016-04-01

Miniaturized optical spectrometers can be implemented by an array of Fabry-Pérot (FP) filters. FP filters are composed of two highly reflecting parallel mirrors and a resonance cavity. Each filter transmits a small spectral band (filter line) depending on its individual cavity height. The optical nanospectrometer, a miniaturized FP-based spectrometer, implements 3D NanoImprint technology for the fabrication of multiple FP filter cavities in a single process step. However, it is challenging to avoid the dependency of residual layer (RL) thickness on the shape of the printed patterns in NanoImprint. Since in a nanospectrometer the filter cavities vary in height between neighboring FP filters and, thus, the volume of each cavity varies causing that the RL varies slightly or noticeably between different filters. This is one of the few disadvantages of NanoImprint using soft templates such as substrate conformal imprint lithography which is used in this paper. The advantages of large area soft templates can be revealed substantially if the problem of laterally inhomogeneous RLs can be avoided or reduced considerably. In the case of the nanospectrometer, non-uniform RLs lead to random variations in the designed cavity heights resulting in the shift of desired filter lines. To achieve highly uniform RLs, we report a volume-equalized template design with the lateral distribution of 64 different cavity heights into several units with each unit comprising four cavity heights. The average volume of each unit is kept constant to obtain uniform filling of imprint material per unit area. The imprint results, based on the volume-equalized template, demonstrate highly uniform RLs of 110 nm thickness.

Surface properties of UV irradiated PC–TiO{sub 2} nanocomposite film

Energy Technology Data Exchange (ETDEWEB)

Jaleh, B., E-mail: bkjaleh@yahoo.com; Shahbazi, N.

2014-09-15

Highlights: • Production of PC–TiO{sub 2} nanocomposite films. • Fully characterization of PC–TiO{sub 2} nanocomposite films. • Influence of UV irradiation on surface properties and hardness of PC–TiO{sub 2} nanocomposite film. - Abstract: In this work, polycarbonate–TiO{sub 2} nanocomposite films were prepared with two different percentages. The structure of samples were studied by X-ray diffraction. Thermal stability of the nanocomposites was studied by thermogravimetric analysis (TGA). The polycarbonate and polycarbonate–TiO{sub 2} nanocomposite films were exposed by UV light at different irradiation times. The effects of UV irradiation on the surface properties of samples have been studied by different characterization techniques, viz. scanning electron microscopy (SEM), FTIR spectroscopy, X-ray photoelectron spectroscopy (XPS), contact angle measurement and Vickers microhardness tester. Hydrophilicity and surface energy of UV treated samples varied depending on UV irradiation time. TGA curves showed that nanocomposite films have higher resistance to thermal degradation compared to polycarbonate. XPS analysis shows that surface of samples become more oxidized due to UV irradiation. For nanocomposite film, the smallest contact angle was observed in association with the longest UV irradiation time. The contact angle significantly decreased from 90° to 12° after 15 h of UV irradiation. It is observed that the hardness of the nanocomposite films increases after UV irradiation.

Ultraviolet radiation for the sterilization of contact lenses

International Nuclear Information System (INIS)

Gritz, D.C.; Lee, T.Y.; McDonnell, P.J.; Shih, K.; Baron, N.

1990-01-01

Two sources of ultraviolet (UV) radiation with peak wavelengths in the UV-C or UV-B ranges were compared for their ability to sterilize contact lenses infected with Pseudomonas aeruginosa, Streptococcus pneumoniae, Acanthamoeba castellani, Candida albicans, and Aspergillus niger. Also examined was the effect of prolonged UV light exposure on soft and rigid gas permeable (RGP) contact lenses. The UV-C lamp (253.7 nm, 250 mW/cm2 at 1 cm) was germicidal for all organisms within 20 minutes but caused destruction of the soft lens polymers within 6 hours of cumulative exposure. UV-C caused damage to RGP lenses in less than 100 hours. The UV-B lamp (290-310 nm, 500 mW/cm2 at 1 cm) was germicidal for all organisms tested (except Aspergillus) with a 180-minute exposure and caused less severe changes in the soft lens polymers than did the UV-C lamp, although cumulative exposure of 300 hours did substantially weaken the soft lens material. RGP materials were minimally affected by exposure to 300 hours of UV-B. Ultraviolet light is an effective germicidal agent but is injurious to soft lens polymers; its possible utility in the sterilization of RGP lenses and lens cases deserves further study

A study on UV irradiated HDPE

International Nuclear Information System (INIS)

Sang Haibo; Liu Zimin; Wu Shishan; Shen Jian

2006-01-01

The structure and properties of HDPE irradiated by ultraviolet (UV) in ozone atmosphere were studied by FT-IR, XPS, gel, and water contact angle test. The oxygen-containing groups such as C=O, C-O and C(=O)O were introduced onto high density polyethylene (HDPE) chains through ultraviolet irradiation in ozone atmosphere, their content increased with the UV irradiation time. Under the same UV irradiation conditions, amount of the oxygen-containing groups introduced in ozone atmosphere was more than that in air atmosphere, indicating that the speed of oxygen-containing groups introduced through UV irradiation in ozone atmosphere was faster than that in air. Therefore, HDPE could be quickly functionalized through UV irradiation in ozone atmosphere. There was no gel formed in the HDPE irradiated in ozone atmosphere. After UV irradiation, the water contact angle of HDPE decreased, and its hydrophilicity was improved, suggesting that the compatibility between the irradiated HDPE and polar polymer or inorganic fillers may be better. Compared with HDPE, the temperature of initial weight loss for irradiated HDPE decreased. The structure and properties of irradiated HDPE/CaCO 3 blend were also investigated. The results showed that the compatibility and interfacial action of the irradiated HDPE/CaCO 3 blend were improved compared to that of HDPE/CaCO 3 blend. The mechanical properties of irradiated HDPE/CaCO 3 blend increased with increasing irradiation time. (authors)

Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography.

Science.gov (United States)

Alayo, Nerea; Conde-Rubio, Ana; Bausells, Joan; Borrisé, Xavier; Labarta, Amilcar; Batlle, Xavier; Pérez-Murano, Francesc

2015-11-06

Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition.

Nanoparticles with tunable shape and composition fabricated by nanoimprint lithography

International Nuclear Information System (INIS)

Alayo, Nerea; Bausells, Joan; Pérez-Murano, Francesc; Conde-Rubio, Ana; Labarta, Amilcar; Batlle, Xavier; Borrisé, Xavier

2015-01-01

Cone-like and empty cup-shaped nanoparticles of noble metals have been demonstrated to provide extraordinary optical properties for use as optical nanoanntenas or nanoresonators. However, their large-scale production is difficult via standard nanofabrication methods. We present a fabrication approach to achieve arrays of nanoparticles with tunable shape and composition by a combination of nanoimprint lithography, hard-mask definition and various forms of metal deposition. In particular, we have obtained arrays of empty cup-shaped Au nanoparticles showing an optical response with distinguishable features associated with the excitations of localized surface plasmons. Finally, this route avoids the most common drawbacks found in the fabrication of nanoparticles by conventional top-down methods, such as aspect ratio limitation, blurring, and low throughput, and it can be used to fabricate nanoparticles with heterogeneous composition. (paper)

Solid state microcavity dye lasers fabricated by nanoimprint lithography

DEFF Research Database (Denmark)

Nilsson, Daniel; Nielsen, Theodor; Kristensen, Anders

2004-01-01

propagating TE–TM modes. The laser cavity has the lateral shape of a trapezoid, supporting lasing modes by reflection on the vertical cavity walls. The solid polymer dye lasers emit laterally through one of the vertical cavity walls, when pumped optically through the top surface by means of a frequency...... doubled, pulsed Nd:YAG laser. Lasing in the wavelength region from 560 to 570 nm is observed from a laser with a side-length of 50 µm. In this proof of concept, the lasers are multimode with a mode wavelength separation of approximately 1.6 nm, as determined by the waveguide propagation constant......We present a solid state polymer microcavity dye laser, fabricated by thermal nanoimprint lithography (NIL) in a dye-doped thermoplast. The thermoplast poly-methylmethacrylate (PMMA) is used due to its high transparency in the visible range and its robustness to laser radiation. The laser dye...

Contact lens surface by electron beam

International Nuclear Information System (INIS)

Shin, Jung Hyuck; Lee, Suk Ju; Hwang, Kwang Ha; Jeon Jin

2011-01-01

Contact lens materials needs good biocompatibility, high refractive index, high optical transparency, high water content etc. Surface treat method by using plasma and radiation can modify the physical and/or chemical properties of the contact lens surface. Radiation technology such as electron beam irradiation can apply to polymerization reaction and enhance the functionality of the polymer.The purpose of this study is to modify of contact lens surface by using Eb irradiation technology. Electron beam was irradiated to the contact lens surface which was synthesized thermal polymerization method and commercial contact lens to modify physical and chemical properties. Ft-IR, XP, UV-vis spectrophotometer, water content, oxygen trans-metastability were used to characterize the surface state, physicochemical, and optical property of the contact lens treated with Eb. The water content and oxygen transmissibility of the contact lens treated with Eb were increased due to increase in the hydrophilic group such as O-C=O and OH group on the contact lens surface which could be produced by possible reaction between carbon and oxygen during the Eb irradiation. All of the lenses showed the high optical transmittance above 90%. In this case of B/Es, TES, Ti contact lens, the optical transmittance decreased about 5% with increasing Eb dose in the wavelength of UV-B region. The contact lens modified by Eb irradiation could improve the physical properties of the contact lens such as water content and oxygen transmissibility

Water and Wastewater Disinfection with Peracetic Acid and UV Radiation and Using Advanced Oxidative Process PAA/UV

Directory of Open Access Journals (Sweden)

Jeanette Beber de Souza

2015-01-01

Full Text Available The individual methods of disinfection peracetic acid (PAA and UV radiation and combined process PAA/UV in water (synthetic and sanitary wastewater were employed to verify the individual and combined action of these advanced oxidative processes on the effectiveness of inactivation of microorganisms indicators of fecal contamination E. coli, total coliforms (in the case of sanitary wastewater, and coliphages (such as virus indicators. Under the experimental conditions investigated, doses of 2, 3, and 4 mg/L of PAA and contact time of 10 minutes and 60 and 90 s exposure to UV radiation, the results indicated that the combined method PAA/UV provided superior efficacy when compared to individual methods of disinfection.

Micropollutants removal by full-scale UV-C/sulfate radical based Advanced Oxidation Processes.

Science.gov (United States)

Rodríguez-Chueca, J; Laski, E; García-Cañibano, C; Martín de Vidales, M J; Encinas, Á; Kuch, B; Marugán, J

2018-07-15

The high chemical stability and the low biodegradability of a vast number of micropollutants (MPs) impede their correct treatment in urban wastewater treatment plants. In most cases, the chemical oxidation is the only way to abate them. Advanced Oxidation Processes (AOPs) have been experimentally proved as efficient in the removal of different micropollutants at lab-scale. However, there is not enough information about their application at full-scale. This manuscript reports the application of three different AOPs based on the addition of homogeneous oxidants [hydrogen peroxide, peroxymonosulfate (PMS) and persulfate anions (PS)], in the UV-C tertiary treatment of Estiviel wastewater treatment plant (Toledo, Spain) previously designed and installed in the facility for disinfection. AOPs based on the photolytic decomposition of oxidants have been demonstrated as more efficient than UV-C radiation alone on the removal of 25 different MPs using low dosages (0.05-0.5 mM) and very low UV-C contact time (4-18 s). Photolysis of PMS and H 2 O 2 reached similar average MPs removal in all the range of oxidant dosages, obtaining the highest efficiency with 0.5 mM and 18 s of contact time (48 and 55% respectively). Nevertheless, PMS/UV-C reached slightly higher removal than H 2 O 2 /UV-C at low dosages. So, these treatments are selective to degrade the target compounds, obtaining different removal efficiencies for each compound regarding the oxidizing agent, dosages and UV-C contact time. In all the cases, H 2 O 2 /UV-C is more efficient than PMS/UV-C, comparing the ratio cost:efficiency (€/m 3 ·order). Even H 2 O 2 /UV-C treatments are more efficient than UV-C alone. Thus, the addition of 0.5 mM of H 2 O 2 compensates the increased of UV-C contact time and therefore the increase of electrical consumption, that it should be need to increase the removal of MPs by UV-C treatments alone. Copyright © 2018 Elsevier B.V. All rights reserved.

Hot embossing holographic images in BOPP shrink films through large-area roll-to-roll nanoimprint lithography

Energy Technology Data Exchange (ETDEWEB)

Jiang, Menglin; Lin, Shiwei, E-mail: linsw@hainu.edu.cn; Jiang, Wenkai; Pan, Nengqian

2014-08-30

Highlights: • High-quality holographic images were replicated in large-area shrink film. • Surface morphology evolution was analyzed in films embossed at different temperatures. • Optical, mechanical, and thermal characteristics were systematically analyzed. - Abstract: Diffraction grating-based holographic images have been successfully replicated in biaxially oriented polypropylene (BOPP) shrink films through large-area roll-to-roll nanoimprint technique. Such hot embossing of holographic images on BOPP films represents a promising means of creating novel security features in packaging applications. The major limitation of the high-quality replication is the relatively large thermal shrinkage of BOPP shrink film. However, although an appropriate shrinkage is demanded after embossing, over-shrinking not only causes distortion in embossed images, but also reduces the various properties of BOPP shrink films mainly due to the disappearance of orientation. The effects of embossing temperature on the mechanical, thermal and optical properties as well as polymer surface morphologies were systematically analyzed. The results show that the optimal process parameters are listed as follows: the embossing temperature at 104–110 °C, embossing force 6 kg/cm{sup 2} and film speed 32 m/min. The variation in flow behavior of polymer surface during hot embossing process is highly dependent on the temperature. In addition, the adhesion from the direct contact between the rubber press roller and polymer surfaces is suggested to cause the serious optical properties failure.

Integrating anti-reflection and superhydrophobicity of moth-eye-like surface morphology on a large-area flexible substrate

International Nuclear Information System (INIS)

Liu, Chia-Hsing; Niu, Pei-Lun; Sung, Cheng-Kuo

2014-01-01

This paper proposes an ultraviolet nanoimprint lithography (UV-NIL) roll-to-roll (R2R) process with argon and oxygen (Ar–O 2 ) plasma ashing and coating of a dilute perfluorodecyltrichlorosilane (FDTS) layer to fabricate the large-area moth-eye-like surface morphology on a polyethylene terephthalate substrate. By using Maxwell-Garnett's effective medium theory, the optimal dimensions of the moth-eye-like surface morphology was designed and fabricated with UV-NIL R2R process to obtain maximum transmittance ratio. In addition, the base angle (θ = 30.1°) of the moth-eye-like surface morphology was modified with Ar–O 2 plasma ashing and coated with a dilute FDTS layer to possess both superhydrophobic and air-retention properties. This increases both the transmittance ratio of 4% and contact angle to 153°. (paper)

A 3D-printed device for polymer nanoimprint lithography

Science.gov (United States)

Caño-García, Manuel; Geday, Morten A.; Gil-Valverde, Manuel; Megías Zarco, Antonio; Otón, José M.; Quintana, Xabier

2018-02-01

Nanoimprint lithography (NIL) is an imprinting technique which has experienced an increasing popularity due to its versatility in fabrication processes. Commercial NIL machines are readily available achieving high quality results; however, these machines involve a relatively high investment. Hence, small laboratories often choose to perform NIL copies in a more rudimentary and cheaper way. A new simple system is presented in this document. It is based on two devices which can be made in-house in plastic by using a 3D printer or in aluminum. Thus, the overall manufacturing complexity is vastly reduced. The presented system includes pressure control and potentially temperature control. Replicas have been made using a sawtooth grating master with a pitch around half micrometre. High quality patterns with low density of imperfections have been achieved in 2.25 cm2 surfaces. The material chosen for the negative intermediary mould is PDMS. Tests of the imprint have been performed using the commercial hybrid polymer Ormostamp®.

Alternative nano-structured thin-film materials used as durable thermal nanoimprint lithography templates

Science.gov (United States)

Bossard, M.; Boussey, J.; Le Drogoff, B.; Chaker, M.

2016-02-01

Nanoimprint templates made of diamond-like carbon (DLC) and amorphous silicon carbide (SiC) thin films and fluorine-doped associated materials, i.e. F-DLC and F-SiC were investigated in the context of thermal nanoimprint lithography (NIL) with respect to their release properties. Their performances in terms of durability and stability were evaluated and compared to those of conventional silicon or silica molds coated with antisticking molecules applied as a self-assembled monolayer. Plasma-enhanced chemical vapor deposition parameters were firstly tuned to optimize mechanical and structural properties of the DLC and SiC thin films. The impact of the amount of fluorine dopant on the deposited thin films properties was then analyzed. A comparative analysis of DLC, F-DLC as well as SiC and F-SiC molds was then carried out over multiple imprints, performed into poly (methyl methacrylate) (PMMA) thermo-plastic resist. The release properties of un-patterned films were evaluated by the measurement of demolding energies and surface energies, associated with a systematic analysis of the mold surface contamination. These analyses showed that the developed materials behave as intrinsically easy-demolding and contamination-free molds over series of up to 40 imprints. To our knowledge, it is the first time that such a large number of imprints has been considered within an exhaustive comparative study of materials for NIL. Finally, the developed materials went through standard e-beam lithography and plasma etching processes to obtain nanoscale-patterned templates. The replicas of those patterned molds, imprinted into PMMA, were shown to be of high fidelity and good stability after several imprints.

Nanoimprint system development and status for high volume semiconductor manufacturing

Science.gov (United States)

Hiura, Hiromi; Takabayashi, Yukio; Takashima, Tsuneo; Emoto, Keiji; Choi, Jin; Schumaker, Phil

2016-10-01

Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash Imprint Lithography* (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. For imprint lithography, recent attention has been given to the areas of overlay, throughput, defectivity, and mask replication. This paper reviews progress in these critical areas. Recent demonstrations have proven that mix and match overlay of less than 5nm can achieved. Further reductions require a higher order correction system. Modeling and experimental data are presented which provide a path towards reducing the overlay errors to less than 3nm. Throughput is mainly impacted by the fill time of the relief images on the mask. Improvement in resist materials provides a solution that allows 15 wafers per hour per station, or a tool throughput of 60 wafers per hour. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. Finally, on the mask side, a new replication tool, the FPA-1100NR2 is

Nanoimprinted polymer chips for light induced local heating of liquids in micro- and nanochannels

DEFF Research Database (Denmark)

Thamdrup, Lasse Højlund; Pedersen, Jonas Nyvold; Flyvbjerg, Henrik

2010-01-01

A nanoimprinted polymer chip with a thin near-infrared absorber layer that enables light-induced local heating (LILH) of liquids inside micro- and nanochannels is presented. An infrared laser spot and corresponding hot-spot could be scanned across the device. Large temperature gradients yield...... a 785 nm laser diode was focused from the backside of the chip to a spot diameter down to 5 ..m in the absorber layer, yielding a localized heating (Gaussian profile) and large temperature gradients in the liquid in the nanochannels. A laser power of 38 mW yielded a temperature of 40°C in the center...

Inactivation of Aspergillus flavus in drinking water after treatment with UV irradiation followed by chlorination

International Nuclear Information System (INIS)

Al-Gabr, Hamid Mohammad; Zheng, Tianling; Yu, Xin

2013-01-01

The disinfection process for inactivating microorganisms at drinking water treatment plants is aimed for safety of drinking water for humans from a microorganism, such as bacteria, viruses, algae, fungi by using chlorination, ozonation, UV irradiation, etc. In the present study, a combination of two disinfectants, UV irradiation followed by chlorination, was evaluated for inactivating Aspergillus flavus under low contact time and low dosage of UV irradiation. The results indicated an inverse correlation between the inactivation of A. flavus by using UV irradiation only or chlorination alone. By using UV radiation, the 2 log 10 control of A. flavus was achieved after 30 s of irradiation, while chlorination was observed to be more effective than UV, where the 2 log was achieved at chlorine concentration of 0.5, 1, 2 and 3 mg/l, in contact time of 60, 5, 1 and 1 min, respectively. However, combined use (UV irradiation followed by chlorination) was more effective than using either UV or chlorination alone; 5 s UV irradiation followed by chlorination produced 4 log 10 reduction of A. flavus at chlorine concentrations of 2 and 3 mg/l under a contact time of 15 min. The results indicated that efficiency of UV irradiation improves when followed by chlorination at low concentrations. - Highlights: • As a disinfectant, chlorine is more effective than UV in inactivating Aspergillus flavus. • As a combined method, UV irradiation followed by chlorination shows high efficiency. • UV irradiation can improve effectiveness of chlorination in reducing Aspergillus flavus

Wettability modification of human tooth surface by water and UV and electron-beam radiation

International Nuclear Information System (INIS)

Tiznado-Orozco, Gaby E.; Reyes-Gasga, José; Elefterie, Florina; Beyens, Christophe; Maschke, Ulrich; Brès, Etienne F.

2015-01-01

The wettability of the human tooth enamel and dentin was analyzed by measuring the contact angles of a drop of distilled water deposited on the surface. The samples were cut along the transverse and longitudinal directions, and their surfaces were subjected to metallographic mirror-finish polishing. Some samples were also acid etched until their microstructure became exposed. Wettability measurements of the samples were done in dry and wet conditions and after ultraviolet (UV) and electron beam (EB) irradiations. The results indicate that water by itself was able to increase the hydrophobicity of these materials. The UV irradiation momentarily reduced the contact angle values, but they recovered after a short time. EB irradiation raised the contact angle and maintained it for a long time. Both enamel and dentin surfaces showed a wide range of contact angles, from approximately 10° (hydrophilic) to 90° (hydrophobic), although the contact angle showed more variability on enamel than on dentin surfaces. Whether the sample's surface had been polished or etched did not influence the contact angle value in wet conditions. - Highlights: • Human tooth surface wettability changes in dry/wet and UV/EB radiation conditions. • More variability in contact angle is observed on enamel than on dentin surfaces. • Water by itself increases the hydrophobicity of the human tooth surface. • UV irradiation reduces momentarily the human tooth surface hydrophobicity. • EB irradiation increases and maintains the hydrophobicity for a long time

Wettability modification of human tooth surface by water and UV and electron-beam radiation

Energy Technology Data Exchange (ETDEWEB)

Tiznado-Orozco, Gaby E., E-mail: gab0409@gmail.com [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Unidad Académica de Odontología, Universidad Autónoma de Nayarit, Edificio E7, Ciudad de la Cultura “Amado Nervo”, C.P. 63190 Tepic, Nayarit (Mexico); Reyes-Gasga, José, E-mail: jreyes@fisica.unam.mx [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Instituto de Física, UNAM, Circuito de la Investigación s/n, Ciudad Universitaria, 04510 Coyoacan, México, D.F. (Mexico); Elefterie, Florina, E-mail: elefterie_florina@yahoo.com [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Beyens, Christophe, E-mail: christophe.beyens@ed.univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Maschke, Ulrich, E-mail: Ulrich.Maschke@univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France); Brès, Etienne F., E-mail: etienne.bres@univ-lille1.fr [UMET, Bâtiment C6, Université de Lille 1, Sciences et Technologies, 59650 Villeneuve d' Ascq (France)

2015-12-01

The wettability of the human tooth enamel and dentin was analyzed by measuring the contact angles of a drop of distilled water deposited on the surface. The samples were cut along the transverse and longitudinal directions, and their surfaces were subjected to metallographic mirror-finish polishing. Some samples were also acid etched until their microstructure became exposed. Wettability measurements of the samples were done in dry and wet conditions and after ultraviolet (UV) and electron beam (EB) irradiations. The results indicate that water by itself was able to increase the hydrophobicity of these materials. The UV irradiation momentarily reduced the contact angle values, but they recovered after a short time. EB irradiation raised the contact angle and maintained it for a long time. Both enamel and dentin surfaces showed a wide range of contact angles, from approximately 10° (hydrophilic) to 90° (hydrophobic), although the contact angle showed more variability on enamel than on dentin surfaces. Whether the sample's surface had been polished or etched did not influence the contact angle value in wet conditions. - Highlights: • Human tooth surface wettability changes in dry/wet and UV/EB radiation conditions. • More variability in contact angle is observed on enamel than on dentin surfaces. • Water by itself increases the hydrophobicity of the human tooth surface. • UV irradiation reduces momentarily the human tooth surface hydrophobicity. • EB irradiation increases and maintains the hydrophobicity for a long time.

Kinetic removal of haloacetonitrile precursors by photo-based advanced oxidation processes (UV/H2O2, UV/O3, and UV/H2O2/O3).

Science.gov (United States)

Srithep, Sirinthip; Phattarapattamawong, Songkeart

2017-06-01

The objective of the study is to evaluate the performance of conventional treatment process (i.e., coagulation, flocculation, sedimentation and sand filtration) on the removals of haloacetonitrile (HAN) precursors. In addition, the removals of HAN precursors by photo-based advanced oxidation processes (Photo-AOPs) (i.e., UV/H 2 O 2 , UV/O 3 , and UV/H 2 O 2 /O 3 ) are investigated. The conventional treatment process was ineffective to remove HAN precursors. Among Photo-AOPs, the UV/H 2 O 2 /O 3 was the most effective process for removing HAN precursors, followed by UV/H 2 O 2 , and UV/O 3 , respectively. For 20min contact time, the UV/H 2 O 2 /O 3 , UV/H 2 O 2 , and UV/O 3 suppressed the HAN formations by 54, 42, and 27% reduction. Increasing ozone doses from 1 to 5 mgL -1 in UV/O 3 systems slightly improved the removals of HAN precursors. Changes in pH (6-8) were unaffected most of processes (i.e., UV, UV/H 2 O 2 , and UV/H 2 O 2 /O 3 ), except for the UV/O 3 system that its efficiency was low in the weak acid condition. The pseudo first-order kinetic constant for removals of dichloroacetonitrile precursors (k' DCANFP ) by the UV/H 2 O 2 /O 3 , UV/H 2 O 2 and standalone UV systems were 1.4-2.8 orders magnitude higher than the UV/O 3 process. The kinetic degradation of dissolved organic nitrogen (DON) tended to be higher than the k' DCANFP value. This study firstly differentiates the kinetic degradation between DON and HAN precursors. Copyright © 2017 Elsevier Ltd. All rights reserved.

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

Directory of Open Access Journals (Sweden)

Sun-Kyu Lee

2017-05-01

Full Text Available We propose a nanofabrication process to generate large-area arrays of noble metal nanoparticles on glass substrates via nanoimprinting and dewetting of metallic thin films. Glass templates were made via pattern transfer from a topographic Si mold to an inorganically cross-linked sol–gel (IGSG resist on glass using a two-layer polydimethylsiloxane (PDMS stamp followed by annealing, which turned the imprinted resist into pure silica. The transparent, topographic glass successfully templated the assembly of Au and Ag nanoparticle arrays via thin-film deposition and dewetting at elevated temperatures. The microstructural and mechanical characteristics that developed during the processes were discussed. The results are promising for low-cost mass fabrication of devices for several photonic applications.

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting.

Science.gov (United States)

Lee, Sun-Kyu; Hwang, Sori; Kim, Yoon-Kee; Oh, Yong-Jun

2017-01-01

We propose a nanofabrication process to generate large-area arrays of noble metal nanoparticles on glass substrates via nanoimprinting and dewetting of metallic thin films. Glass templates were made via pattern transfer from a topographic Si mold to an inorganically cross-linked sol-gel (IGSG) resist on glass using a two-layer polydimethylsiloxane (PDMS) stamp followed by annealing, which turned the imprinted resist into pure silica. The transparent, topographic glass successfully templated the assembly of Au and Ag nanoparticle arrays via thin-film deposition and dewetting at elevated temperatures. The microstructural and mechanical characteristics that developed during the processes were discussed. The results are promising for low-cost mass fabrication of devices for several photonic applications.

An assessment of the process capabilities of nanoimprint lithography

Science.gov (United States)

Balla, Tobias; Spearing, S. Mark; Monk, Andrew

2008-09-01

Nanoimprint lithography (NIL) is an emerging nanofabrication tool, able to replicate imprint patterns quickly and at high volumes. The present study was performed in order to define the capabilities of NIL, based on a study of published research and to identify the application areas where NIL has the greatest potential. The process attributes of different NIL process chains were analysed, and their process capabilities were compared to identify trends and process limitations. The attributes chosen include the line width, relief height, initial resist thickness, residual layer thickness, imprint area and line width tolerances. In each case well-defined limits can be identified, which are a direct result of the mechanisms involved in the NIL process. These quantitative results were compared with the assessments of individuals in academia and within the microfabrication industry. The results suggest NIL is most suited to producing photonic, microfluidic and patterned media applications, with photonic applications the closest to market. NIL needs to address overlay alignment issues for wider use, while an analysis is needed for each market, as to whether NIL adds value.

Wastewater disinfection alternatives: chlorine, ozone, peracetic acid, and UV light.

Science.gov (United States)

Mezzanotte, V; Antonelli, M; Citterio, S; Nurizzo, C

2007-11-01

Disinfection tests were carried out at pilot scale to compare the disinfection efficiency of ozone, sodium hypochlorite (NaOCl), peracetic acid (PAA), and UV irradiation. Total coliforms, fecal coliforms, and Escherichia coli were monitored as reference microorganisms. Total heterotrophic bacteria (THB) were also enumerated by cytometry. At similar doses, NaOCl was more effective than PAA, and its action was less affected by contact time. The results obtained by ozonation were comparable for total coliforms, fecal coliforms, and E. coli. On the contrary, some differences among the three indicators were observed for NaOCl, PAA, and UV. Differences increased with increasing values of the disinfectant concentration times contact time (C x t) and were probably the result of different initial counts, as total coliforms include fecal coliforms, which include E. coli. The UV irradiation lead to complete E. coli removals, even at low doses (10 to 20 mJ/cm2). Total heterotrophic bacteria appeared to be too wide a group to be a good disinfection indicator; no correlation was found among THB inactivation, dose, and contact time.

Nanomanipulation of 2 inch wafer fabrication of vertically aligned carbon nanotube arrays by nanoimprint lithography

DEFF Research Database (Denmark)

Bu, Ian Y. Y.; Eichhorn, Volkmar; Carlson, Kenneth

2011-01-01

Carbon nanotube (CNT) arrays are typically defined by electron beam lithography (EBL), and hence limited to small areas due to the low throughput. To obtain wafer‐scale fabrication we propose large area thermal nanoimprint lithography (NIL). A 2‐inch stamp master is defined using EBL for subsequent......, efficient production of wafer‐scale/larger arrays of CNTs has been achieved. The CNTs have been deposited by wafer‐scale plasma enhanced chemical vapour deposition (PECVD) of C2H2/NH3. Substrates containing such nanotubes have been used to automate nanorobotic manipulation sequences of individual CNTs...

A method for manufacturing a tool part for an injection molding process, a hot embossing process, a nano-imprint process, or an extrusion process

DEFF Research Database (Denmark)

2013-01-01

The present invention relates to a method for manufacturing a tool part for an injection molding process, a hot embossing process, nano-imprint process or an extrusion process. First, there is provided a master structure (10) with a surface area comprising nanometre-sized protrusions (11...

A compact system for large-area thermal nanoimprint lithography using smart stamps

International Nuclear Information System (INIS)

Pedersen, R H; Hansen, O; Kristensen, A

2008-01-01

We present a simple apparatus for thermal nanoimprint lithography. In this work, the stamp is designed to significantly reduce the requirements for pressure application on the external imprint system. By MEMS-based processing, an air cavity inside the stamp is created, and the required pressure for successful imprint is reduced. Additionally, the stamp is capable of performing controlled demolding after imprint. Due to the complexity of the stamp, a compact and cost-effective imprint apparatus can be constructed. The design and fabrication of the advanced stamp as well as the simple imprint equipment is presented. Test imprints of micrometer- and nanometer-scale structures are performed and characterized with respect to uniformity across a large area (35 mm radius). State-of-the-art uniformity for µm-scale features is demonstrated

Polymer microlens replication by Nanoimprint Lithography using proton beam fabricated Ni stamp

International Nuclear Information System (INIS)

Dutta, R.K.; Kan, J.A. van; Bettiol, A.A.; Watt, F.

2007-01-01

It is essential to have a simplified and a rapid method for fabricating micro/nano structures in different kinds of polymeric materials. Though it is possible to fabricate arrays of microlens directly by P beam writing (PBW), it is restricted to a few types of resist materials. Therefore we have fabricated a Ni electroplated metallic stamp comprising of arrays of inverse/negative features of microlenses. The metallic stamp of about 500 μm thick is made on a silicon wafer coated with 10 μm thick polymethylglutarimide (PMGI) resist and the desired structures are written by PBW followed by thermal reflow and Ni electroplating. An array of microlenses is imprinted on a polycarbonate (PC) substrate by the Nanoimprint Lithography (NIL) technique and the replicated microlenses featuring various numerical apertures, diameters and pitches are characterized

Polymer waveguide Bragg grating Fabry–Perot filter using a nanoimprinting technique

International Nuclear Information System (INIS)

Binfeng, Yun; Guohua, Hu; Yiping, Cui

2014-01-01

A narrow band waveguide Fabry–Perot filter at 1550 nm, which is composed of two polymer waveguide Bragg gratings as reflectors, is presented. By using conventional lithography, a low-loss polymer channel waveguide was fabricated, and the submicron Bragg grating structure was transferred onto the waveguide surface using a nanoimprinting technique. The transmission spectrum of the device was measured, and the results show that there is a very narrow transmission peak, with a 3 dB bandwidth of 0.011 nm in the 0.38 nm rejection band of the waveguide Bragg grating. A quality factor of Q ≈ 1.41 × 10 5 is achieved. The insertion loss and the extinction ratio of the Fabry–Perot filter are about −12.5 dB and 17 dB, respectively. In addition, the measured transmission spectrum is in excellent accordance with the numerical simulation. (paper)

Two-dimensional grating guided-mode resonance tunable filter.

Science.gov (United States)

Kuo, Wen-Kai; Hsu, Che-Jung

2017-11-27

A two-dimensional (2D) grating guided-mode resonance (GMR) tunable filter is experimentally demonstrated using a low-cost two-step nanoimprinting technology with a one-dimensional (1D) grating polydimethylsiloxane mold. For the first nanoimprinting, we precisely control the UV LED irradiation dosage and demold the device when the UV glue is partially cured and the 1D grating mold is then rotated by three different angles, 30°, 60°, and 90°, for the second nanoimprinting to obtain 2D grating structures with different crossing angles. A high-refractive-index film ZnO is then coated on the surface of the grating structure to form the GMR filter devices. The simulation and experimental results demonstrate that the passband central wavelength of the filter can be tuned by rotating the device to change azimuth angle of the incident light. We compare these three 2D GMR filters with differential crossing angles and find that the filter device with a crossing angle of 60° exhibits the best performance. The tunable range of its central wavelength is 668-742 nm when the azimuth angle varies from 30° to 90°.

Mass loss and chemical structures of wheat and maize straws in response to ultraviolet-B radiation and soil contact

Science.gov (United States)

Zhou, Guixiang; Zhang, Jiabao; Mao, Jingdong; Zhang, Congzhi; Chen, Lin; Xin, Xiuli; Zhao, Bingzi

2015-01-01

The role of photodegradation, an abiotic process, has been largely overlooked during straw decomposition in mesic ecosystems. We investigated the mass loss and chemical structures of straw decomposition in response to elevated UV-B radiation with or without soil contact over a 12-month litterbag experiment. Wheat and maize straw samples with and without soil contact were exposed to three radiation levels: a no-sunlight control, ambient solar UV-B, and artificially elevated UV-B radiation. A block control with soil contact was not included. Compared with the no-sunlight control, UV-B radiation increased the mass loss by 14–19% and the ambient radiation by 9–16% for wheat and maize straws without soil contact after 12 months. Elevated UV-B exposure decreased the decomposition rates of both wheat and maize straws when in contact with soil. Light exposure resulted in decreased O-alkyl carbons and increased alkyl carbons for both the wheat and maize straws compared with no-sunlight control. The difference in soil contact may influence the contribution of photodegradation to the overall straw decomposition process. These results indicate that we must take into account the effects of photodegradation when explaining the mechanisms of straw decomposition in mesic ecosystems. PMID:26423726

Mass loss and chemical structures of wheat and maize straws in response to ultraviolet-B radiation and soil contact.

Science.gov (United States)

Zhou, Guixiang; Zhang, Jiabao; Mao, Jingdong; Zhang, Congzhi; Chen, Lin; Xin, Xiuli; Zhao, Bingzi

2015-10-01

The role of photodegradation, an abiotic process, has been largely overlooked during straw decomposition in mesic ecosystems. We investigated the mass loss and chemical structures of straw decomposition in response to elevated UV-B radiation with or without soil contact over a 12-month litterbag experiment. Wheat and maize straw samples with and without soil contact were exposed to three radiation levels: a no-sunlight control, ambient solar UV-B, and artificially elevated UV-B radiation. A block control with soil contact was not included. Compared with the no-sunlight control, UV-B radiation increased the mass loss by 14-19% and the ambient radiation by 9-16% for wheat and maize straws without soil contact after 12 months. Elevated UV-B exposure decreased the decomposition rates of both wheat and maize straws when in contact with soil. Light exposure resulted in decreased O-alkyl carbons and increased alkyl carbons for both the wheat and maize straws compared with no-sunlight control. The difference in soil contact may influence the contribution of photodegradation to the overall straw decomposition process. These results indicate that we must take into account the effects of photodegradation when explaining the mechanisms of straw decomposition in mesic ecosystems.

Three-dimensional particle tracking in concave structures made by ultraviolet nanoimprint via total internal reflection fluorescence microscopy and refractive-index-matching method

Science.gov (United States)

Fujinami, Taku; Kigami, Hiroshi; Unno, Noriyuki; Taniguchi, Jun; Satake, Shin-ichi

2018-03-01

Total internal reflection fluorescence microscopy (TIRFM) is a promising method for measuring fluid flow close to a wall with nanoscale resolution in a process that is termed "multilayer nanoparticle image velocimetry" (MnPIV). TIRFM uses evanescent light that is generated on a substrate (typically a glass slide) by total internal reflection of light. Many researchers have previously studied x-y-z (3D) flows of water close to flat glass slides using MnPIV. On the other hand, a fluid flow close to a structured surface is also important. To measure flows of water near micro-patterns, we previously developed an MnPIV technique that uses a refractive-index-matching method. In previous study, the micropattern is made of a thermoplastic material with a refractive index that closely matches that of water. In this study, ultraviolet nanoimprint lithography was used for fabricating the appropriate micro-patterns because this technique can fabricate a pattern with a high resolution. As a result, we succeeded in performing MnPIV in water with a circular hole array pattern made by ultraviolet nanoimprint using a refractive-index-matching method. We believe that this technique will be helpful in elucidating fluid flows around microstructures.

Host cell reactivation and UV-enhanced reactivation in synchronized mammalian cells

International Nuclear Information System (INIS)

Lytle, C.D.; Schmidt, B.J.

1981-01-01

Does host cell reactivation (HCR) or UV-enhanced reactivation (UVER) of UV-irradiated Herpes simplex virus (UV-HSV) vary during the host mammalian cell cycle. The answer could be useful for interpreting UVER and or the two-component nature of the UV-HSV survival curve. Procedures were developed for infection of mitotically-synchronized CV-l monkey kidney cells. All virus survival curves determined at different cell cycle stages had two components with similar D 0 's and intercepts of the second components. Thus, no single stage of the host cell cycle was responsible for the second component of the virus survival curve. When the cells were UV-irradiated immediately prior to infection, enhanced survival of UV-HSV occurred for cell irradiation and virus infection initiated during late G 1 early S phase or late S early G 2 phase but not during early G 1 phase. For infection delayed by 24 h after cell irradiation, UVER was found at all investigated times. These results indicate that: (1) HCR is similar at all stages of the host cell cycle: and (2) the ''induction'' of UVER is not as rapid for cell-irradiation in early G 1 phase. This latter observation may be one reason why normal, contact-inhibited cells do not express UVER as rapidly as faster growing, less contact-inhibited cells. (author)

Contact Aligner 2 (Front Side): Suss Microtec MA8

Data.gov (United States)

Federal Laboratory Consortium — Description:CORAL Name: SussMA8This system utilizes 1X contact lithography to transfer photomask patterns onto substrates Specifications / Capabilities:UV broadband...

Ultrahigh-frequency surface acoustic wave generation for acoustic charge transport in silicon

NARCIS (Netherlands)

Büyükköse, S.; Vratzov, B.; van der Veen, Johan (CTIT); Santos, P.V.; van der Wiel, Wilfred Gerard

2013-01-01

We demonstrate piezo-electrical generation of ultrahigh-frequency surface acoustic waves on silicon substrates, using high-resolution UV-based nanoimprint lithography, hydrogen silsequioxane planarization, and metal lift-off. Interdigital transducers were fabricated on a ZnO layer sandwiched between

Fabrication of sub-wavelength photonic structures by nanoimprint lithography

Energy Technology Data Exchange (ETDEWEB)

Kontio, J.

2013-11-01

Nanoimprint lithography (NIL) is a novel but already a mature lithography technique. In this thesis it is applied to the fabrication of nanophotonic devices using its main advantage: the fast production of sub-micron features in high volume in a cost-effective way. In this thesis, fabrication methods for conical metal structures for plasmonic applications and sub-wavelength grating based broad-band mirrors are presented. Conical metal structures, nanocones, with plasmonic properties are interesting because they enable concentrating the energy of light in very tight spots resulting in very high local intensities of electromagnetic energy. The nanocone formation process is studied with several metals. Enhanced second harmonic generation using gold nanocones is presented. Bridged-nanocones are used to enhance Raman scattering from a dye solution. The sub-wavelength grating mirror is an interesting structure for photonics because it is very simple to fabricate and its reflectivity can be extended to the far infrared wavelength range. It also has polarization dependent properties which are used in this thesis to stabilize the output beam of infrared semiconductor disk laser. NIL is shown to be useful a technique in the fabrication of nanophotonic devices in the novel and rapidly growing field of plasmonics and also in more traditional, but still developing, semiconductor laser applications (orig.)

Study of nanoimprint lithography (NIL) for HVM of memory devices

Science.gov (United States)

Kono, Takuya; Hatano, Masayuki; Tokue, Hiroshi; Kobayashi, Kei; Suzuki, Masato; Fukuhara, Kazuya; Asano, Masafumi; Nakasugi, Tetsuro; Choi, Eun Hyuk; Jung, Wooyung

2017-03-01

A low cost alternative lithographic technology is desired to meet the decreasing feature size of semiconductor devices. Nano-imprint lithography (NIL) is one of the candidates for alternative lithographic technologies.[1][2][3] NIL has such advantages as good resolution, critical dimension (CD) uniformity and low line edge roughness (LER). On the other hand, the critical issues of NIL are defectivity, overlay, and throughput. In order to introduce NIL into the HVM, it is necessary to overcome these three challenges simultaneously.[4]-[12] In our previous study, we have reported a dramatic improvement in NIL process defectivity on a pilot line tool, FPA-1100 NZ2. We have described that the NIL process for 2x nm half pitch is getting closer to the target of HVM.[12] In this study, we report the recent evaluation of the NIL process performance to judge the applicability of NIL to memory device fabrications. In detail, the CD uniformity and LER are found to be less than 2nm. The overlay accuracy of the test device is less than 7nm. A defectivity level of below 1pcs./cm2 has been achieved at a throughput of 15 wafers per hour.

Fabrication of zero contact angle ultra-super hydrophilic surfaces.

Science.gov (United States)

Jothi Prakash, C G; Clement Raj, C; Prasanth, R

2017-06-15

Zero contact angle surfaces have been created with the combined effect of nanostructure and UV illumination. The contact angle of titanium surface has been optimized to 3.25°±1°. with nanotubular structures through electrochemical surface modification. The porosity and surface energy of tubular TiO 2 layer play critical role over the surface wettability and the hydrophilicity of the surface. The surface free energy has been enhanced from 23.72mJ/m 2 (bare titanium surface) to 87.11mJ/m 2 (nanotubular surface). Similar surface with TiO 2 nanoparticles coating shows superhydrophilicity with contact angle up to 5.63°±0.95°. This implies liquid imbibition and surface curvature play a crucial role in surface hydrophilicity. The contact angle has been further reduced to 0°±0.86° by illuminating the surface with UV radiation. Results shows that by tuning the nanotube morphology, highly porous surfaces can be fabricated to reduce contact angle and enhance wettability. This study provides an insight into the inter-relationship between surface structural factors and ultra-superhydrophilic surfaces which can help to optimize thermal hydraulic and self cleaning surfaces. Copyright © 2017. Published by Elsevier Inc.

Novel magnetic wire fabrication process by way of nanoimprint lithography for current induced magnetization switching

Science.gov (United States)

Asari, Tsukasa; Shibata, Ryosuke; Awano, Hiroyuki

2017-05-01

Nanoimprint lithography (NIL) is an effective method to fabricate nanowire because it does not need expensive systems and this process is easier than conventional processes. In this letter, we report the Current Induced Magnetization Switching (CIMS) in perpendicularly magnetized Tb-Co alloy nanowire fabricated by NIL. The CIMS in Tb-Co alloy wire was observed by using current pulse under in-plane external magnetic field (HL). We successfully observed the CIMS in Tb-Co wire fabricated by NIL. Additionally, we found that the critical current density (Jc) for the CIMS in the Tb-Co wire fabricated by NIL is 4 times smaller than that fabricated by conventional lift-off process under HL = 200Oe. These results indicate that the NIL is effective method for the CIMS.

Reflectance spectra characteristics from an SPR grating fabricated by nano-imprint lithography technique for biochemical nanosensor applications

Science.gov (United States)

Setiya Pradana, Jalu; Hidayat, Rahmat

2018-04-01

In this paper, we report our research work on developing a Surface Plasmon Resonance (SPR) element with sub-micron (hundreds of nanometers) periodicity grating structure. This grating structure was fabricated by using a simple nano-imprint lithography technique from an organically siloxane polymers, which was then covered by nanometer thin gold layer. The formed grating structure was a very well defined square-shaped periodic structure. The measured reflectance spectra indicate the SPR wave excitation on this grating structure. For comparison, the simulations of reflectance spectra have been also carried out by using Rigorous Coupled-Wave Analysis (RCWA) method. The experimental results are in very good agreement with the simulation results.

Multifunctional guest-host particles engineered by reversal nanoimprint lithography

Science.gov (United States)

Ha, Uh-Myong; Kaban, Burhan; Tomita, Andreea; Krekić, Kristijan; Klintuch, Dieter; Pietschnig, Rudolf; Ehresmann, Arno; Holzinger, Dennis; Hillmer, Hartmut

2018-03-01

Particulate polymeric microfibers with incorporated europium(III)oxide (Eu2O3) nanoparticles were introduced as a magneto-photoluminescent multifunctional material fabricated via reversal nanoimprint lithography. To specifically address the volume properties of these guest-host particles, the guest, Eu2O3, was milled down to an average particle size of 350 nm in diameter and mixed with the host-polymer, AMONIL®, before in situ hardening in the imprint stamp. The variation of the fabrication process parameters, i.e. delay time, spin coating speed, as well as the concentration of Eu2O3 nanoparticles was proven to have a significant impact on both the structure quality and the stamp release of the microfibers with respect to the formation of a thinner residual layer. Structural characterization performed by SEM revealed optimum fabrication process parameters for a homogeneous spatial distribution of Eu2O3 nanoparticles within the microfibers while simultaneously avoiding the formation of undesired agglomerates. The magneto-photoluminescent properties of Eu2O3 nanoparticles, i.e. a red emission at 613 nm and a paramagnetic response, were found to be superimposed to the optic and the diamagnetic behaviors of AMONIL®. The results imply that guest-host interdependence of these properties can be excluded and that the suggested technique enables for specific tailoring of particulate multifunctional materials with focus on their volume properties.

Single-mode biological distributed feedback laser

DEFF Research Database (Denmark)

Vannahme, Christoph; Maier-Flaig, Florian; Lemmer, Uli

2013-01-01

Single-mode second order distributed feedback (DFB) lasers of riboflavin (vitamin B2) doped gelatine films on nanostructured low refractive index material are demonstrated. Manufacturing is based on a simple UV nanoimprint and spin-coating. Emission wavelengths of 543 nm and 562 nm for two...

Novel magnetic wire fabrication process by way of nanoimprint lithography for current induced magnetization switching

Directory of Open Access Journals (Sweden)

Tsukasa Asari

2017-05-01

Full Text Available Nanoimprint lithography (NIL is an effective method to fabricate nanowire because it does not need expensive systems and this process is easier than conventional processes. In this letter, we report the Current Induced Magnetization Switching (CIMS in perpendicularly magnetized Tb-Co alloy nanowire fabricated by NIL. The CIMS in Tb-Co alloy wire was observed by using current pulse under in-plane external magnetic field (HL. We successfully observed the CIMS in Tb-Co wire fabricated by NIL. Additionally, we found that the critical current density (Jc for the CIMS in the Tb-Co wire fabricated by NIL is 4 times smaller than that fabricated by conventional lift-off process under HL = 200Oe. These results indicate that the NIL is effective method for the CIMS.

Characterization of ZnO coated polyester fabrics for UV protection

International Nuclear Information System (INIS)

Broasca, G.; Borcia, G.; Dumitrascu, N.; Vrinceanu, N.

2013-01-01

The textile industry aims to develop fabrics adapted to environmental conditions, in particular to UV radiation. Taking into account the demand for such materials, we prepare an inorganic–organic material, based on ZnO microparticles impregnation of polyester textiles, to perform combined UV-protection properties and high hydrophobicity. Scanning electron microscopy, UV reflectance, Impedance Spectroscopy, contact angle, air permeability, resistance to vapor transfer and tensile strength measurement are used for analysis of the surface and volume properties, related to the performance of the material under environmental conditions, as UV radiation, water and water vapors. The impregnation method ensures a good homogeneity and dispersion of ZnO microparticles into the textile polymeric matrix. The optimum level of impregnation of the fabrics is established to 3–5% ZnO, yielding stable properties, without overloading the fabric. The response of the coated polymer indicates better absorbing the UV radiation and dissipating the surface charge, time stability against UV and higher hydrophobic character, without modification of the mechanical properties, offering enhanced performance and comfort under environmental conditions.

Efficient low bandgap polymer solar cell with ordered heterojunction defined by nanoimprint lithography.

Science.gov (United States)

Yang, Yi; Mielczarek, Kamil; Zakhidov, Anvar; Hu, Walter

2014-11-12

In this work, we demonstrate the feasibility of using nanoimprint lithography (NIL) to make efficient low bandgap polymer solar cells with well-ordered heterojunction. High quality low bandgap conjugated polymer poly[2,6-(4,4-bis(2-ethylhexyl)-4H-cyclopenta[2,1-b;3,4-b']-dithiophene)-alt-4,7-(2,1,3-benzothiadiazole)] (PCPDTBT) nanogratings are fabricated using this technique for the first time. The geometry effect of PCPDTBT nanostructures on the solar cell performance is investigated by making PCPDTBT/C70 solar cells with different feature sizes of PCPDTBT nanogratings. It is found that the power conversion efficiency (PCE) increases with increasing nanograting height, PCPDTBT/C70 junction area, and decreasing nanograting width. We also find that NIL makes PCPDTBT chains interact more strongly and form an improved structural ordering. Solar cells made on the highest aspect ratio PCPDTBT nanostructures are among the best reported devices using the same material with a PCE of 5.5%.

Nanoimprint-Transfer-Patterned Solids Enhance Light Absorption in Colloidal Quantum Dot Solar Cells

KAUST Repository

Kim, Younghoon

2017-03-13

Colloidal quantum dot (CQD) materials are of interest in thin-film solar cells due to their size-tunable bandgap and low-cost solution-processing. However, CQD solar cells suffer from inefficient charge extraction over the film thicknesses required for complete absorption of solar light. Here we show a new strategy to enhance light absorption in CQD solar cells by nanostructuring the CQD film itself at the back interface. We use two-dimensional finite-difference time-domain (FDTD) simulations to study quantitatively the light absorption enhancement in nanostructured back interfaces in CQD solar cells. We implement this experimentally by demonstrating a nanoimprint-transfer-patterning (NTP) process for the fabrication of nanostructured CQD solids with highly ordered patterns. We show that this approach enables a boost in the power conversion efficiency in CQD solar cells primarily due to an increase in short-circuit current density as a result of enhanced absorption through light-trapping.

Nanoimprint-defined, large-area meta-surfaces for unidirectional optical transmission with superior extinction in the visible-to-infrared range.

Science.gov (United States)

Yao, Yuhan; Liu, He; Wang, Yifei; Li, Yuanrui; Song, Boxiang; Wang, Richard P; Povinelli, Michelle L; Wu, Wei

2016-07-11

Optical devices with asymmetric transmission have important applications in optical systems, but optical isolators with the modal asymmetry can only be built using magneto-optical or nonlinear materials, as dictated by the Lorentz reciprocity theorem. However, optical devices with the power asymmetry can be achieved by linear materials such as metals and dielectrics. In this paper, we report a large-area, nanoimprint-defined meta-surface (stacked subwavelength gratings) with high-contrast asymmetric transmittance in the visible-to-infrared wavelength range for TM-polarized light. The physical origin of asymmetric transmission through the meta-surface is studied by analyzing the scattering matrix.

Contact Aligner 1 (Front and Back Side): Suss Microtec MA6

Data.gov (United States)

Federal Laboratory Consortium — Description:CORAL Name: SussMA6This system utilizes 1X contact lithography to transfer photomask patterns onto substrates Specifications / Capabilities:UV broadmand...

Modification of rubber surface by UV surface grafting

International Nuclear Information System (INIS)

Shanmugharaj, A.M.; Kim, Jin Kuk; Ryu, Sung Hun

2006-01-01

Rubber surface is subjected to ultraviolet radiation (UV) in the presence of allylamine and radiation sensitizer benzophenone (BP). Fourier transform infrared spectral studies reveal the presence of allylamine on the surface. The presence of irregular needle shapes on the surface as observed in scanning electron micrographs also confirms the polymerized allylamine on the surface. Allylamine coatings have been further confirmed from atomic force microscopy (AFM) analysis. Thermogravimetric analysis (TGA) reveals that allylamine coating on the rubber surface lowers the thermal degradation rate. The contact angle between the water and rubber surface decreases for the modified rubber surface confirming the surface modification due to UV surface grafting

Robust superhydrophobic tungsten oxide coatings with photochromism and UV durability properties

Energy Technology Data Exchange (ETDEWEB)

Jiang, Ting [Hubei Collaborative Innovation Centre for Advanced Organic Chemical Materials and Ministry-of-Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, 430062 (China); State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730000 (China); Guo, Zhiguang, E-mail: zguo@licp.cas.cn [Hubei Collaborative Innovation Centre for Advanced Organic Chemical Materials and Ministry-of-Education Key Laboratory for the Green Preparation and Application of Functional Materials, Hubei University, Wuhan, 430062 (China); State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou, 730000 (China)

2016-11-30

Highlights: • Superhydrophobic tungsten oxide (TO) coatings with a water contact angle (WCA) of 155° and rolling angle of 3.5° were developed. • The superhydrophobic coatings have excellent mechanical robustness and UV durability. • The superhydrophobic TO coatings show the reversible convert of photochromism. • The coating exhibited excellent self-cleaning behavior due to its high WCA and low rolling angle. - Abstract: Robust superhydrophobic tungsten oxide (TO) coatings with a water contact angle (WCA) of 155° were developed for photochromism via a facile and substrate-independent route. Importantly, after scatch test on both a single and two orthogonal direction, the TO coating still exhibited superhydrophobic behavior, indicating excellent mechanical robustness. It is worth mentioning that the superhydrophobic TO coatings showed the reversible convert of photochromism of WO{sub 3} induced by alternating UV and visible light irradiation. Besides that, the TO coating remained superhydrophobicity after UV irradiation for 36 h, showing excellent UV durability. In addition, the coating showed good resistance to acidic droplets. Moreover, it can also be applied on other substrates, such as copper mesh, steel, paper and fiber. The coating exhibited excellent self-cleaning behavior due to its high WCA and low rolling angle. Overall, this work is a promising approach to design and produce functional superhydrophobic coatings for various substrates.

Advanced nanoimprint patterning for functional electronics and biochemical sensing

Science.gov (United States)

Wang, Chao

Nano-fabrication has been widely used for a variety of disciplines, including electronics, material science, nano-optics, and nano-biotechnology. This dissertation focuses on nanoimprint lithography (NIL) based novel nano-patterning techniques for fabricating functional structures, and discusses their applications in advanced electronics and high-sensitivity molecular sensing. In this dissertation, examples of using nano-fabricated structures for promising electronic applications are presented. For instance, 10 nm and 18 nm features are NIL-fabricated for Si/SiGe heterojunction tunneling transistors and graphene nano-ribbon transistors, using shadow evaporation and line-width shrinking techniques, respectively. An ultrafast laser melting based method is applied on flexible plastic substrates to correct defects of nano-features. Nano-texturing of sapphire substrate is developed to improve the light extraction of GaN light emitting diodes (LEDs) by 70 %. A novel multi-layer nano-patterned Si-mediated catalyst is discovered to grow straight and uniform Si nanowires with optimized properties in size, location, and crystallization on amorphous SiO2 substrate. Nano-structures are also functionalized into highly sensitive bio-chemical sensors. Plasmonic nano-bar antenna arrays are demonstrated to effectively sense infrared molecules >10 times better than conventional plasmonic sensors. As small as 20 nm wide nano-channel fluidic devices are developed to linearize and detect DNA molecules for potential DNA sequencing. An integrated fluidic system is built to incorporate plasmonic nano-structures for 30X-enhanced fluorescence detection of large DNA molecules.

Low temperature fabrication of conductive silver lines and dots via transfer-printing and nanoimprinting lithography techniques

International Nuclear Information System (INIS)

Wu, Chun-Chang; Hsu, Steve Lien-Chung; Chiu, Ching-Wei; Wu, Jung-Tang

2013-01-01

In this work, we have developed novel methods to fabricate conductive silver tracks and dots directly from silver nitrate solution by transfer-printing and nanoimprinting lithography techniques, which are inexpensive and can be scaled down to the nanometer scale. The silver nitrate precursor can be reduced in ethylene glycol vapor to form silver at low temperatures. Energy dispersive spectrometric analysis results indicate that the silver nitrate has been converted to silver completely. In order to obtain smooth and continuous conductive patterned silver features with high resolution, the silver lines with widths of a few tens of micrometers to nanometers were patterned by using a spin-coating approach. Using a 14 M silver nitrate solution, continuous silver conductive lines with a resistivity of 8.45 × 10 −5 Ω cm has been produced. (paper)

A class I (Senofilcon A) soft contact lens prevents UVB-induced ocular effects, including cataract, in the rabbit in vivo.

Science.gov (United States)

Giblin, Frank J; Lin, Li-Ren; Leverenz, Victor R; Dang, Loan

2011-06-01

UVB radiation from sunlight is known to be a risk factor for human cataract. The purpose in this study was to investigate the ability of a class I UV-blocking soft contact lens to protect against UVB-induced effects on the ocular tissues of the rabbit in vivo. Eyes of rabbits were exposed to UVB light for 30 minutes (270-360 nm, peak at 310 nm, 1.7 mW/cm(2) on the cornea). Eyes were irradiated in the presence of either a UV-blocking senofilcon A contact lens, a minimally UV-blocking lotrafilcon A contact lens, or no contact lens at all. Effects on the cornea and lens were evaluated at various times after exposure. Eyes irradiated with no contact lens protection showed corneal epithelial cell loss plus lens epithelial cell swelling, vacuole formation, and DNA single-strand breaks, as well as lens anterior subcapsular opacification. The senofilcon A lens protected nearly completely against the UVB-induced effects, whereas the lotrafilcon A lens showed no protection. The results indicate that use of a senofilcon A contact lens is beneficial in protecting ocular tissues of the rabbit against the harmful effects of UVB light, including photokeratitis and cataract.

UV-durable superhydrophobic textiles with UV-shielding properties by coating fibers with ZnO/SiO2 core/shell particles

Science.gov (United States)

Xue, Chao-Hua; Yin, Wei; Jia, Shun-Tian; Ma, Jian-Zhong

2011-10-01

ZnO/SiO2 core/shell particles were fabricated by successive coating of multilayer polyelectrolytes and then a SiO2 shell onto ZnO particles. The as-prepared ZnO/SiO2 core/shell particles were coated on poly(ethylene terephthalate) (PET) textiles, followed by hydrophobization with hexadecyltrimethoxysilane, to fabricate superhydrophobic surfaces with UV-shielding properties. Transmission electron microscopy and ζ potential analysis were employed to evidence the fabrication of ZnO/SiO2 core/shell particles. Scanning electron microscopy and thermal gravimetric analysis were conducted to investigate the surface morphologies of the textile and the coating of the fibers. Ultraviolet-visible spectrophotometry and contact angle measurement indicated that the incorporation of ZnO onto fibers imparted UV-blocking properties to the textile surface, while the coating of SiO2 shell on ZnO prohibited the photocatalytic degradation of hexadecyltrimethoxysilane by ZnO, making the as-treated PET textile surface show stable superhydrophobicity with good UV-shielding properties.

Superior light trapping in thin film silicon solar cells through nano imprint lithography

Energy Technology Data Exchange (ETDEWEB)

Soppe, W.J.; Dorenkamper, M.S.; Schropp, R.E.I.; Pex, P.P.A.C.

2013-10-15

ECN and partners have developed a fabrication process based on nanoimprint lithography (NIL) of textures for light trapping in thin film solar cells such as thin-film silicon, OPV, CIGS and CdTe. The process can be applied in roll-to-roll mode when using a foil substrate or in roll-to-plate mode when using a glass substrate. The lacquer also serves as an electrically insulating layer for cells if steel foil is used as substrate, to enable monolithic series interconnection. In this paper we will show the superior light trapping in thin film silicon solar cells made on steel foil with nanotextured back contacts. We have made single junction a-Si and {mu}c-Si and a-Si/{mu}c-Si tandem cells, where we applied several types of nano-imprints with random and periodic structures. We will show that the nano-imprinted back contact enables more than 30% increase of current in comparison with non-textured back contacts and that optimized periodic textures outperform state-of-the-art random textures. For a-Si cells we obtained Jsc of 18 mA/cm{sup 2} and for {mu}c-Si cells more than 24 mA/cm{sup 2}. Tandem cells with a total Si absorber layer thickness of only 1350 nm have an initial efficiency of 11%.

Super Water-Repellent Fractal Surfaces of a Photochromic Diarylethene Induced by UV Light

Science.gov (United States)

Izumi, Norikazu; Minami, Takayuki; Mayama, Hiroyuki; Takata, Atsushi; Nakamura, Shinichiro; Yokojima, Satoshi; Tsujii, Kaoru; Uchida, Kingo

2008-09-01

Photochromic diarylethene forms super water-repellent surfaces upon irradiation with UV light. Microfibril-like crystals grow on the solid diarylethene surface after UV irradiation, and the contact angle of water on the surface becomes larger with increasing surface roughness with time. The fractal analysis was made by the box-counting method for the rough surfaces. There are three regions in the roughness size having the fractal dimension of ca. 2.4 (size of roughness smaller than 5 µm), of ca. 2.2 (size of roughness between 5-40 µm), and of ca. 2.0 (size of roughness larger than 40 µm). The fractal dimension of ca. 2.4 was due to the fibril-like structures generated gradually by UV irradiation on diarylethene surfaces accompanied with an increase in the contact angle. The surface structure with larger fractal dimension mainly contributes to realizing the super water-repellency of the diarylethene surfaces. This mechanism of spontaneous formation of fractal surfaces is similar to that for triglyceride and alkylketene dimer waxes.

Fabrication of high-aspect-ratio microstructures using dielectrophoresis-electrocapillary force-driven UV-imprinting

International Nuclear Information System (INIS)

Li, Xiangming; Shao, Jinyou; Tian, Hongmiao; Ding, Yucheng; Li, Xiangmeng

2011-01-01

We propose a novel method for fabricating high-aspect-ratio micro-/nano-structures by dielectrophoresis-electrocapillary force (DEP-ECF)-driven UV-imprinting. The force of DEP-ECF, acting on an air–liquid interface and an air–liquid–solid three-phase contact line, is generated by applying voltage between an electrically conductive mold and a substrate, and tends to pull the dielectric liquid (a UV-curable pre-polymer) into the mold micro-cavities. The existence of DEP-ECF is explained theoretically and demonstrated experimentally by the electrically induced reduction of the contact angle. Furthermore, DEP-ECF is proven to play a critical role in forcing the polymer to fill into the mold cavities by the real-time observation of the dynamic filling process. Using the DEP-ECF-driven UV-imprinting process, high-aspect-ratio polymer micro-/nano-structures (more than 10:1) are fabricated with high consistency. This patterning method can overcome the drawbacks of the mechanically induced mold deformation and position shift in conventional imprinting lithography and maximize the pattern uniformity which is usually poor in capillary force lithography

Synthesis and characterization of UV-absorbing fluorine-silicone acrylic resin polymer

Science.gov (United States)

Lei, Huibin; He, Deliang; Guo, Yanni; Tang, Yining; Huang, Houqiang

2018-06-01

A series of UV-absorbing fluorine-silicone acrylic resin polymers containing different amount of UV-absorbent were successfully prepared by solution polymerization, with 2-[3-(2H-Benzotriazol-2-yl)-4-hydroxyphenyl] ethyl methacrylate (BHEM), vinyltrimethoxysilane (VTMS) and hexafluorobutyl methacrylate (HFMA) as modifying monomers. The acrylic polymers and the coatings thereof were characterized by Fourier transform infrared spectrum (FT-IR), X-ray photoelectron spectroscopy (XPS), Ultraviolet-visible (UV-vis) absorption spectrum, thermogravimetric analysis (TGA), water contact angle (CA) and Xenon lamp artificial accelerated aging tests. Results indicated that the resin exhibited high UV absorption performance as well as good thermal stability. The hydrophobicity of the coatings was of great improvement because of the bonded fluorine and silicone. Meanwhile, the weather-resistance was promoted through preferably colligating the protective effects of BHEM, organic fluorine and silicone. Also, a fitting formula about the weatherability with the BMHE content was tentatively proposed.

Nanoimprinted backside reflectors for a-Si:H thin-film solar cells: critical role of absorber front textures.

Science.gov (United States)

Tsao, Yao-Chung; Fisker, Christian; Pedersen, Thomas Garm

2014-05-05

The development of optimal backside reflectors (BSRs) is crucial for future low cost and high efficiency silicon (Si) thin-film solar cells. In this work, nanostructured polymer substrates with aluminum coatings intended as BSRs were produced by positive and negative nanoimprint lithography (NIL) techniques, and hydrogenated amorphous silicon (a-Si:H) was deposited hereon as absorbing layers. The relationship between optical properties and geometry of front textures was studied by combining experimental reflectance spectra and theoretical simulations. It was found that a significant height variation on front textures plays a critical role for light-trapping enhancement in solar cell applications. As a part of sample preparation, a transfer NIL process was developed to overcome the problem of low heat deflection temperature of polymer substrates during solar cell fabrication.

CUVE - Cubesat UV Experiment: Unveil Venus' UV Absorber with Cubesat UV Mapping Spectrometer

Science.gov (United States)

Cottini, V.; Aslam, S.; D'Aversa, E.; Glaze, L.; Gorius, N.; Hewagama, T.; Ignatiev, N.; Piccioni, G.

2017-09-01

Our Venus mission concept Cubesat UV Experiment (CUVE) is one of ten proposals selected for funding by the NASA PSDS3 Program - Planetary Science Deep Space SmallSat Studies. CUVE concept is to insert a CubeSat spacecraft into a Venusian orbit and perform remote sensing of the UV spectral region using a high spectral resolution point spectrometer to resolve UV molecular bands, observe nightglow, and characterize the unidentified main UV absorber. The UV spectrometer is complemented by an imaging UV camera with multiple bands in the UV absorber main band range for contextual imaging. CUVE Science Objectives are: the nature of the "Unknown" UV-absorber; the abundances and distributions of SO2 and SO at and above Venus's cloud tops and their correlation with the UV absorber; the atmospheric dynamics at the cloud tops, structure of upper clouds and wind measurements from cloud-tracking; the nightglow emissions: NO, CO, O2. This mission will therefore be an excellent platform to study Venus' cloud top atmospheric properties where the UV absorption drives the planet's energy balance. CUVE would complement past, current and future Venus missions with conventional spacecraft, and address critical science questions cost effectively.

uvsI mutants defective in UV mutagenesis define a fourth epistatic group of uvs genes in Aspergillus.

Science.gov (United States)

Chae, S K; Kafer, E

1993-01-01

Three UV-sensitive mutations of A. nidulans, uvsI, uvsJ and uvsA, were tested for epistatic relationships with members of the previously established groups, here called the "UvsF", "UvsC", and "UvsB" groups. uvsI mutants are defective for spontaneous and induced reversion of certain point mutations and differ also for other properties from previously analyzed uvs types. They are very sensitive to the killing effects of UV-light and 4-NQO (4-nitro-quinoline-N-oxide) but not to MMS (methylmethane sulfonate). When double- and single-mutant uvs strains were compared for sensitivity to these three agents, synergistic or additive effects were found for uvsI with all members of the three groups. The uvsI gene may therefore represent a fourth epistatic group, possibly involved in mutagenic repair. On the other hand, uvsJ was clearly epistatic with members of the UvsF group and fitted well into this group also by phenotype. The uvsA gene was tentatively assigned to the UvsC group. uvsA showed epistatic interactions with uvsC in all tests, and like UvsC-group mutants is UV-sensitive mainly in dividing cells. However, the uvsA mutation does not cause the defects in recombination and UV mutagenesis typical for this group.

Supersensitive, Fast-Response Nanowire Sensors by Using Schottky Contacts

KAUST Repository

Hu, Youfan

2010-05-31

A Schottky barrier can be formed at the interface between a metal electrode and a semiconductor. The current passing through the metal-semiconductor contact is mainly controlled by the barrier height and barrier width. In conventional nanodevices, Schottky contacts are usually avoided in order to enhance the contribution made by the nanowires or nanotubes to the detected signal. We present a key idea of using the Schottky contact to achieve supersensitive and fast response nanowire-based nanosensors. We have illustrated this idea on several platforms: UV sensors, biosensors, and gas sensors. The gigantic enhancement in sensitivity of up to 5 orders of magnitude shows that an effective usage of the Schottky contact can be very beneficial to the sensitivity of nanosensors. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Postannealing Effect at Various Gas Ambients on Ohmic Contacts of Pt/ZnO Nanobilayers toward Ultraviolet Photodetectors

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Chung-Hua Chao

2013-01-01

Full Text Available This paper describes a fabrication and characterization of ultraviolet (UV photodetectors based on Ohmic contacts using Pt electrode onto the epitaxial ZnO (0002 thin film. Plasma enhanced chemical vapor deposition (PECVD system was employed to deposit ZnO (0002 thin films onto silicon substrates, and radio-frequency (RF magnetron sputtering was used to deposit Pt top electrode onto the ZnO thin films. The as-deposited Pt/ZnO nanobilayer samples were then annealed at 450∘C in two different ambients (argon and nitrogen to obtain optimal Ohmic contacts. The crystal structure, surface morphology, optical properties, and wettability of ZnO thin films were analyzed by X-ray diffraction (XRD, field emission scanning electron microscopy (FE-SEM, atomic force microscopy (AFM, photoluminescence (PL, UV-Vis-NIR spectrophotometer, and contact angle meter, respectively. Moreover, the photoconductivity of the Pt/ZnO nanobilayers was also investigated for UV photodetector application. The above results showed that the optimum ZnO sample was synthesized with gas flow rate ratio of 1 : 3 diethylzinc [DEZn, Zn(C2H52] to carbon dioxide (CO2 and then combined with Pt electrode annealed at 450∘C in argon ambient, exhibiting good crystallinity as well as UV photo responsibility.

Ultrafast, superhigh gain visible-blind UV detector and optical logic gates based on nonpolar a-axial GaN nanowire

Science.gov (United States)

Wang, Xingfu; Zhang, Yong; Chen, Xinman; He, Miao; Liu, Chao; Yin, Yian; Zou, Xianshao; Li, Shuti

2014-09-01

Nonpolar a-axial GaN nanowire (NW) was first used to construct the MSM (metal-semiconductor-metal) symmetrical Schottky contact device for application as visible-blind ultraviolet (UV) detector. Without any surface or composition modifications, the fabricated device demonstrated a superior performance through a combination of its high sensitivity (up to 104 A W-1) and EQE value (up to 105), as well as ultrafast (memory storage.Nonpolar a-axial GaN nanowire (NW) was first used to construct the MSM (metal-semiconductor-metal) symmetrical Schottky contact device for application as visible-blind ultraviolet (UV) detector. Without any surface or composition modifications, the fabricated device demonstrated a superior performance through a combination of its high sensitivity (up to 104 A W-1) and EQE value (up to 105), as well as ultrafast (memory storage. Electronic supplementary information (ESI) available: Details of the EDS and SAED data, supplementary results of the UV detector, and the discussion of the transport properties of the MSM Schottky contact devices. See DOI: 10.1039/c4nr03581j

Electrowetting of liquid polymer on petal-mimetic microbowl-array surfaces for formation of microlens array with varying focus on a single substrate

Science.gov (United States)

Li, Xiangmeng; Shao, Jinyou; Li, Xiangming; Tian, Hongmiao

2015-03-01

In this paper, microlens array with varying focal lengths were fabricated on a single microbowl-array textured substrate. The solid microbowl-arrayed NOA61 (kind of polyurethane-based polymer with UV curablity) surface was resulted from nanoimprinting by polydimethylsiloxane (PDMS) mold. The PDMS mold was replicated from an SU-8 master which was generated by electron beam lithography. Such microbowl-arrayed surfaces demonstrate petal-mimetic highly adhesive hydrophobic wetting properties, which can promote an irreversible electrowetting (EW) effect and a dereased contact angle of water droplets as well as other liquid droplets by applying direct current (DC) voltage. To fabricate a microlens array with varying focal-lengths, liquid NOA61 was supplied from a syringe on the solid NOA61 microtextured film and DC voltage was applied succesively. After removing the DC voltage, these liquid NOA61 microdrops deposited on the solid microtextured NOA61 surface on tin-indium-oxide coated substrate could be solidified via UV irradiation, thus leading to microlens array with uneven numerical apertures on a single substrate. Numerical simulation was also done to verify the EW effect. Finally, optical imaging characterization was performed to confirm the varied focus of the NOA61 microdrops.

Intensification of UV-C tertiary treatment: Disinfection and removal of micropollutants by sulfate radical based Advanced Oxidation Processes.

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Rodríguez-Chueca, J; García-Cañibano, C; Lepistö, R-J; Encinas, Á; Pellinen, J; Marugán, J

2018-04-21

This study explores the enhancement of UV-C tertiary treatment by sulfate radical based Advanced Oxidation Processes (SR-AOPs), including photolytic activation of peroxymonosulfate (PMS) and persulfate (PS) and their photocatalytic activation using Fe(II). Their efficiency was assessed both for the inactivation of microorganisms and the removal or micropollutants (MPs) in real wastewater treatment plant effluents. Under the studied experimental range (UV-C dose 5.7-57 J/L; UV-C contact time 3 to 28 s), the photolysis of PMS and PS (0.01 mM) increased up to 25% the bacterial removal regarding to UV-C system. The photolytic activation of PMS led to the total inactivation of bacteria (≈ 5.70 log) with the highest UV-C dose (57 J/L). However, these conditions were insufficient to remove the MPs, being required oxidant's dosages of 5 mM to remove above 90% of carbamazepine, diclofenac, atenolol and triclosan. The best efficiencies were achieved by the combination of PMS or PS with Fe(II), leading to the total removal of the MPs using a low UV-C dosage (19 J/L), UV-C contact time (9 s) and reagent's dosages (0.5 mM). Finally, high mineralization was reached (>50%) with photocatalytic activation of PMS and PS even with low reagent's dosages. Copyright © 2018 Elsevier B.V. All rights reserved.

3D visualization of mold filling stages in thermal nanoimprint by white light interferometry and atomic force microscopy

International Nuclear Information System (INIS)

Schift, Helmut; Gobrecht, Jens; Kim, Geehong; Lee, Jaejong

2009-01-01

A method for continuous 3D visualization of the mold filling at a microscopic level during a thermoplastic nanoimprint process was developed. It is based on superposition of micrographs of a series of different stages of imprint. It was applied to two common 3D microscopies with different resolution limitations. Due to advanced image processing, the animated movie sequence, available as supplementary multimedia information in the online version of this journal, gives an unprecedented insight into the complex polymer flow and shows how voids are forming and vanishing during the imprint process around micropillars. The method has advantages over current real-time methods and can be used as an analytical tool for optimization of processes and improvement of stamp design down to the sub-10 nm nanometer range.

UV Deprivation Influences Social UV Preference in Juvenile Sticklebacks

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Ricarda Modarressie

2015-05-01

Full Text Available Social aggregations occur in many different animal taxa and mainly result from non-random assortment. Investigating factors that shape and maintain the composition of social aggregations are among others a main topic for understanding ecological speciation processes. Aggregation decisions are mediated by olfactory and visual cues, which in many animals are extended into the UV part of the electromagnetic spectrum. Here, we were interested in developmental plasticity of social preferences with respect to UV radiation in aquatic organisms. Specifically, we tested whether different lighting environments with respect to UV wavelengths during early life stages influence the shoaling preference in juvenile threespine sticklebacks (Gasterosteus aculeatus. Family (full-sibling groups were split and reared under UV-lacking (UV- and UV-present (UV+ lighting conditions. Subsequent shoal choice experiments, in which test fish from both rearing conditions could simultaneously choose between a shoal seen behind a UV-blocking (UV- and a shoal seen behind a UV-transmitting (UV+ filter, revealed a significant effect of lighting condition during rearing on association preference. Test fish that had been deprived of UV spent significantly more time near the UV- shoal compared to the test fish reared under full-spectrum lighting conditions. The results are discussed with respect to plasticity of the visual system and environmental lighting conditions.

Formation of halogenated C-, N-DBPs from chlor(am)ination and UV irradiation of tyrosine in drinking water

International Nuclear Information System (INIS)

Chu Wenhai; Gao Naiyun; Krasner, Stuart W.; Templeton, Michael R.; Yin Daqiang

2012-01-01

The formation of regulated and emerging halogenated carbonaceous (C-) and nitrogenous disinfection by-products (N-DBPs) from the chlor(am)ination and UV irradiation of tyrosine (Tyr) was investigated. Increased chlorine contact time and/or Cl 2 /Tyr ratio increased the formation of most C-DBPs, with the exception of 4-chlorophenol, dichloroacetonitrile, and dichloroacetamideChloroform and dichloroacetic acid increased with increasing pH, dichloroacetonitrile first increased and then decreased, and other DBPs had maximum yields at pH 7 or 8. The addition of ammonia significantly reduced the formation of most C-DBPs but increased 4-chlorophenol, dichloroacetonitrile, dichloroacetamide, and trichloroacetonitrile yields for short prechlorination contact times before dosing ammonia. When UV irradiation and chlorination were performed simultaneously, the concentrations of the relatively stable C-DBPs increased, and the concentrations of dichloroacetonitrile, dichloroacetamide, and 4-chlorophenol decreased with increasing UV dose. This information was used to develop a mechanistic model for the formation of intermediate DBPs and end products from the interaction of disinfectants with tyrosine. Highlights: ► Increased contact time and/or Cl 2 /Tyr decreased the formation of some N-DBPs. ► Changing the pH of disinfection decreases the formation of some N-DBPs. ► N-DBP yields increased for short prechlorination contact time before dosing ammonia. ► Low pressure UV before chlorination did not impact the formation of DBPs from Tyr. ► A novel integrated formation pathway of halogenated C-, N-DBPs is proposed. - Exploring the integrated formation mechanism of regulated and emerging highly toxic DBPs, which is expected to preferably reduce their occurrence in drinking water.

Influence of interconnection on the long-term reliability of UV LED packages

Science.gov (United States)

Nieland, S.; Mitrenga, D.; Karolewski, D.; Brodersen, O.; Ortlepp, T.

2017-02-01

High power LEDs have conquered the mass market in recent years. Besides the main development focus to achieve higher productivity in the field of visible semiconductor LED processing, the wavelength range is further enhanced by active research and development in the direction of UVA / UVB / UVC. UVB and UVC LEDs are new and promising due to their numerous advantages. UV LEDs emit in a near range of one single emission peak with a width (FWHM) below 15 nm compared to conventional mercury discharge lamps and xenon sources, which show broad spectrums with many emission peaks over a wide range of wavelengths. Furthermore, the UV LED size is in the range of a few hundred microns and offers a high potential of significant system miniaturization. Of course, LED efficiency, lifetime and output power have to be increased [1]. Lifetime limiting issues of UVB/UVC-LED are the very high thermal stress in the chip resulting from the higher forward voltages (6-10 V @ 350 mA), the lower external quantum efficiency, below 10 % (most of the power disappears as heat), and the thermal resistance Rth of conventional LED packages being not able to dissipate these large amounts of heat for spreading. Beside the circuit boards and submounts which should have maximum thermal conductivity, the dimension of contacts as well as the interconnection of UV LED to the submount/package determinates the resolvable amount of heat [2]. In the paper different innovative interconnection techniques for UVC-LED systems will be discussed focused on the optimization of thermal conductivity in consideration of the assembly costs. Results on thermal simulation for the optimal contact dimensions and interconnections will be given. In addition, these theoretical results will be compared with results on electrical characterization as well as IR investigations on real UV LED packages in order to give recommendations for optimal UV LED assembly.

Surface contamination to UV-curable acrylates in the furniture and parquet industry.

Science.gov (United States)

Surakka, J; Lindh, T; Rosén, G; Fischer, T

2001-03-01

Surface contamination to ultraviolet radiation curable coatings (UV coatings), used increasingly in the parquet and furniture industry, is a matter of concern as a source for skin contamination. UV coatings contain chemically and biologically reactive acrylates, well known as skin contact irritants and sensitizers. Surface contamination may spread secondarily to equipment and other unexpected areas even outside the workplace. Yet, studies concerning this type of contamination are lacking due to lack of suitable sampling methods. Surface contamination of the work environment with risk for skin exposure to UV coating was measured employing a quantitative adhesive tape sampling method developed for this purpose. A pilot study was first performed at three workplaces to evaluate the contamination. In the main study, we wanted to locate and identify in detail the surface contamination of areas where problems exist, and to determine the extent of the problem. Measurements were performed at seven workplaces on two separate workdays (round 1 and 2) within a six-month period. Samples were collected from the workplaces based on the video monitoring of skin contact frequency with the surfaces and categorized into three groups to analyze risk. The pilot study indicated that surface contamination to TPGDA containing UV coatings was common, found in 76 percent of the surfaces, and varied with a maximum of 909 microg TPGDA 10 cm(-2) sampling area. In the main study TPGDA was found in 153 out of 196 collected samples (78.1%); for round one 78.1 percent (82 out of 105 samples) and for round two 78.0 percent (71 out of 91 samples). The average TPGDA mass on positive surface samples was on the first round 2,247 +/- 7,462 microg, and on the second round 2,960 +/- 4,590 microg. We conclude that surface contamination to uncured UV coatings at UV-curing lines is common and this involves a risk for harmful, unintentional skin exposure to acrylates.

Fabrication of nano-sized metal patterns on flexible polyethylene-terephthalate substrate using bi-layer nanoimprint lithography

Energy Technology Data Exchange (ETDEWEB)

Hwang, Seon Yong; Jung, Ho Yong [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); Jeong, Jun-Ho [Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, Yuseong-gu Daejeon, 305-343 (Korea, Republic of); Lee, Heon, E-mail: heonlee@korea.ac.k [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of)

2009-05-29

Polymer films are widely used as a substrate for displays and for solar cells since they are cheap, transparent and flexible, and their material properties are easy to design. Polyethylene-terephthalate (PET) is especially useful for various applications requiring transparency, flexibility and good thermal and chemical resistance. In this study, nano-sized metal patterns were fabricated on flexible PET film by using nanoimprint lithography (NIL). Water-soluble poly-vinyl alcohol (PVA) resin was used as a planarization and sacrificial layer for the lift-off process, as it does not damage the PET films and can easily be etched off by using oxygen plasma. NIL was used to fabricate the nano-sized patterns on the non-planar or flexible substrate. Finally, a nano-sized metal pattern was successfully formed by depositing the metal layer over the imprinted resist patterns and applying the lift-off process, which is economic and environmentally friendly, to the PET films.

Large-area 2D periodic crystalline silicon nanodome arrays on nanoimprinted glass exhibiting photonic band structure effects

International Nuclear Information System (INIS)

Becker, C; Lockau, D; Sontheimer, T; Rech, B; Schubert-Bischoff, P; Rudigier-Voigt, E; Bockmeyer, M; Schmidt, F

2012-01-01

Two-dimensional silicon nanodome arrays are prepared on large areas up to 50 cm 2 exhibiting photonic band structure effects in the near-infrared and visible wavelength region by downscaling a recently developed fabrication method based on nanoimprint-patterned glass, high-rate electron-beam evaporation of silicon, self-organized solid phase crystallization and wet-chemical etching. The silicon nanodomes, arranged in square lattice geometry with 300 nm lattice constant, are optically characterized by angular resolved reflection measurements, allowing the partial determination of the photonic band structure. This experimentally determined band structure agrees well with the outcome of three-dimensional optical finite-element simulations. A 16% photonic bandgap is predicted for an optimized geometry of the silicon nanodome arrays. By variation of the duration of the selective etching step, the geometry as well as the optical properties of the periodic silicon nanodome arrays can be controlled systematically. (paper)

Optoelectronic characterisation of an individual ZnO nanowire in contact with a micro-grid template

International Nuclear Information System (INIS)

Jiang Wei; Gao Hong; Xu Ling-Ling; Ma Jia-Ning; Zhang E; Wei Ping; Lin Jia-Qi

2011-01-01

Optoelectronic characterisation of an individual ZnO nanowire in contact with a micro-grid template has been studied. The low-cost micro-grid template made by photolithography is used to fabricate the ohmic contact metal electrodes. The current increases linearly with the bias, indicating good ohmic contacts between the nanowire and the electrodes. The resistivity of the ZnO nanowire is calculated to be 3.8 Ω·cm. We investigate the photoresponses of an individual ZnO nanowire under different light illumination using light emitting diodes (λ = 505 nm, 460 nm, 375 nm) as excitation sources in atmosphere. When individual ZnO nanowire is exposured to different light irradiation, we find that it is extremely sensitive to UV illumination; the conductance is much larger upon UV illumination than that in the dark at room temperature. This phenomenon may be related to the surface oxygen molecule adsorbtion, which indicates their potential application to the optoelectronic switching device. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

Fabrication of Robust Superhydrophobic Bamboo Based on ZnO Nanosheet Networks with Improved Water-, UV-, and Fire-Resistant Properties

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Jingpeng Li

2015-01-01

Full Text Available Bamboo with water-resistant, UV-resistant, and fire-resistant properties was desirable in modern society. In this paper, the original bamboo was firstly treated with ZnO sol and then hydrothermally the ZnO nanosheet networks grow onto the bamboo surface and subsequently modified with fluoroalkyl silane (FAS-17. The FAS-17 treated bamboo substrate exhibited not only robust superhydrophobicity with a high contact angle of 161° but also stable repellency towards simulated acid rain (pH = 3 with a contact angle of 152°. Except for its robust superhydrophobicity, such a bamboo also presents superior water-resistant, UV-resistant, and fire-resistant properties.

Enhancement of the fluorescence intensity of DNA intercalators using nano-imprinted 2-dimensional photonic crystal

International Nuclear Information System (INIS)

Endo, Tatsuro; Ueda, China; Hisamoto, Hideaki; Kajita, Hiroshi; Okuda, Norimichi; Tanaka, Satoru

2013-01-01

We have fabricated polymer-based 2-dimensional photonic crystals that play a key role in enhancing the fluorescence of DNA intercalators. Highly ordered 2-dimensional photonic crystals possessing triangle-shaped and nm-sized hole arrays were fabricated on a 100 μm thick polymer film using nano-imprint lithography. Samples of double-stranded DNAs (sizes: 4361 and 48502 bp; concentration: 1 pM to 10 nM) were adsorbed on the surface of the 2-dimensional photonic crystal by electrostatic interactions and then treated with intercalators. It is found that the fluorescence intensity of the intercalator is enhanced by a factor of up to 10 compared to the enhancement in the absence of the 2-dimensional photonic crystal. Fluorescence intensity increases with increasing length and concentration of the DNAs. If the 2-dimensional photonic crystal is used as a Bragg reflection mirror, the enhancement of fluorescence intensity can be easily observed using a conventional spectrofluorometer. These results suggest that the printed photonic crystal offers a great potential for highly sensitive intercalator-based fluorescent detection of DNAs. (author)

Ecotoxicological effect characterisation of widely used organic UV filters.

Science.gov (United States)

Kaiser, D; Sieratowicz, A; Zielke, H; Oetken, M; Hollert, H; Oehlmann, J

2012-04-01

Chemical UV filters are used in sun protection and personal care products in order to protect consumers from skin cancer induced by ultraviolet (UV) radiation. The present study aims to evaluate the effects of three common UV filters butyl-methoxydibenzoylmethane (B-MDM) ethylhexyl-methoxycinnamate (EHMC) and octocrylene (OCR) on aquatic organism, focussing particularly on infaunal and epibentic invertebrates (Chironomus riparius, Lumbriculus variegatus, Melanoides tuberculata and Potamopyrgus antipodarum). Due to their life habits, these organism are especially affected by lipophilic substances. Additionally, two direct sediment contact assays utilising zebra fish (Danio rerio) embryos and bacteria (Arthrobacter globiformis) were conducted. EHMC caused a toxic effect on reproduction in both snails with lowest observed effect concentrations (LOEC) of 0.4 mg/kg (Potamopyrgus antipodarum) and 10 mg/kg (Melanoides tuberculata). At high concentrations sublethal effects could be observed for D. rerio after exposure to EHMC (NOEC 100 mg/kg). B-MDM and OCR showed no effects on any of the tested organism. Copyright © 2011 Elsevier Ltd. All rights reserved.

Effects of UV-B radiation on wax biosynthesis

International Nuclear Information System (INIS)

Barnes, J.; Paul, N.; Percy, K.; Broadbent, P.; McLaughlin, C.; Mullineaux, P.; Creissen, G.; Wellburn, A.

1994-01-01

Two genotypes of tobacco (Nicotiana tabacum L.) were exposed in controlled environment chambers to three levels of biologically effective ultraviolet-B radiation (UV-B BE ; 280-320nm): 0, 4.54 (ambient) and 5.66 (∼ 25% enhancement) kJ m -2 d -1 . After 28 days, the quantity of wax deposited on leaf surfaces was determined gravimetrically; epicuticular wax chemical composition was determined by capillary gas chromatography with homologue assignments confirmed by gas chromatography-mass spectrometry. Leaf wettability was assessed by measuring the contact angle of water droplets placed on leaf surfaces. Tobacco wax consisted of three major hydrocarbon classes: Straight-chain alkanes (C 27 -C 33 ) which comprised ∼ 59% of the hydrocarbon fraction, containing a predominance of odd-chain alkanes with C 31 as the most abundant homologue; branched-chain alkanes (C 25 -C 32 ) which comprised ∼38% of the hydrocarbon fraction with anteiso 3-methyltriacontane (C 30 ) as the predominant homologue; and fatty acids (C 14 -C 18 ) which comprised ∼ 3% of the wax. Exposure to enhanced UV-B radiation reduced the quantity of wax on the adaxial surface of the transgenic mutant, and resulted in marked changes in the chemical composition of the wax on the exposed leaf surface. Enhanced UV-B decreased the quantity of straight-chain alkanes, increased the quantity of branched-chain alkanes and fatty acids, and resulted in shifts toward shorter straight-chain lengths. Furthermore, UV-B-induced changes in wax composition were associated with increased wettability of tobacco leaf surfaces. Overall, the data are consistent with the view that UV-B radiation has a direct and fundamental effect on wax biosynthesis. Relationships between the physico-chemical nature of the leaf surface and sensitivity to UV-B radiation are discussed. (orig.)

Femtosecond UV-laser pulses to unveil protein-protein interactions in living cells.

Science.gov (United States)

Itri, Francesco; Monti, Daria M; Della Ventura, Bartolomeo; Vinciguerra, Roberto; Chino, Marco; Gesuele, Felice; Lombardi, Angelina; Velotta, Raffaele; Altucci, Carlo; Birolo, Leila; Piccoli, Renata; Arciello, Angela

2016-02-01

A hallmark to decipher bioprocesses is to characterize protein-protein interactions in living cells. To do this, the development of innovative methodologies, which do not alter proteins and their natural environment, is particularly needed. Here, we report a method (LUCK, Laser UV Cross-linKing) to in vivo cross-link proteins by UV-laser irradiation of living cells. Upon irradiation of HeLa cells under controlled conditions, cross-linked products of glyceraldehyde-3-phosphate dehydrogenase (GAPDH) were detected, whose yield was found to be a linear function of the total irradiation energy. We demonstrated that stable dimers of GAPDH were formed through intersubunit cross-linking, as also observed when the pure protein was irradiated by UV-laser in vitro. We proposed a defined patch of aromatic residues located at the enzyme subunit interface as the cross-linking sites involved in dimer formation. Hence, by this technique, UV-laser is able to photofix protein surfaces that come in direct contact. Due to the ultra-short time scale of UV-laser-induced cross-linking, this technique could be extended to weld even transient protein interactions in their native context.

A Class I UV-Blocking (senofilcon A) Soft Contact Lens Prevents UVA-induced Yellow Fluorescence and NADH loss in the Rabbit Lens Nucleus in vivo

Science.gov (United States)

Giblin, Frank J.; Lin, Li-Ren; Simpanya, Mukoma F.; Leverenz, Victor R.; Fick, Catherine E.

2012-01-01

It is known that fluorescence, much of it caused by UVA light excitation, increases in the aging human lens, resulting in loss of sharp vision. This study used an in vivo animal model to investigate UVA-excited fluorescence in the rabbit lens, which contains a high level of the UVA chromophore NADH, existing both free and bound to λ-crystallin. Also, the ability of a Class I (senofilcon A) soft contact lens to protect against UVA-induced effects on the rabbit lens was tested. Rabbit eyes were irradiated with UVA light in vivo (100 mW/cm2 on the cornea) for 1 hour using monochromatic 365 nm light. Irradiation was conducted in the presence of either a senofilcon A contact lens, a minimally UV-absorbing lotrafilcon A contact lens, or no contact lens at all. Eyes irradiated without a contact lens showed blue 365 nm-excited fluorescence initially, but this changed to intense yellow fluorescence after 1 hour. Isolated, previously irradiated lenses exhibited yellow fluorescence originating from the lens nucleus when viewed under 365 nm light, but showed normal blue fluorescence arising from the cortex. Previously irradiated lenses also exhibited a faint yellow color when observed under visible light. The senofilcon A contact lens protected completely against the UVA-induced effects on fluorescence and lens yellowing, whereas the lotrafilcon A lens showed no protection. The UVA-exposure also produced a 53% loss of total NADH (free plus bound) in the lens nucleus, with only a 13% drop in the anterior cortex. NADH loss in the nucleus was completely prevented with use of a senofilcon A contact lens, but no significant protection was observed with a lotrafilcon A lens. Overall, the senofilcon A lens provided an average of 67% protection against UVA-induced loss of four pyridine nucleotides in four different regions of the lens. HPLC analysis with fluorescence detection indicated a nearly six-fold increase in 365 nm-excited yellow fluorescence arising from lens nuclear �

Efeito do filtro de ultravioleta em lentes de contato hidrofílicas de alta hidratação Ultraviolet filter effect on hydrophilic high hydrated contact lenses

Directory of Open Access Journals (Sweden)

Arlindo José Freire Portes

2008-06-01

Full Text Available A exposição à radiação ultravioleta está relacionada ao aparecimento de patologias oculares como ceratites, cataratas, degenerações maculares ou pterígio. Esta radiação está dividida em 3 tipos de acordo com o seu comprimento de onda: Uv-A (320-400nm, Uv-B (290-320nm e Uv-C (100-290nm. A indústria óptica desenvolveu filtros de ultravioleta para lentes intra-oculares, lentes de contato e lentes de óculos. OBJETIVO: Avaliar a eficácia do filtro de ultravioleta em lentes de contato de alta hidratação. MÉTODOS: Seis grupos de lentes de contato de alta hidratação e de marcas diferentes, contendo 3 unidades novas e iguais foram estudadas, observando-se o percentual de transmissão da energia luminosa de 200 a 400 nm através de um espectofotômetro. RESULTADOS: Os 3 grupos que apresentavam filtro de ultravioleta causaram uma queda abrupta na transmissão da radiação ultravioleta de 400 nm até 340 nm, ocorrendo um aumento na transmissão entre 240 a 300 nm até um nível máximo de 45%. Abaixo de 240 nm e entre 300 e 340 nm, houve um completo bloqueio da transmissão da radiação ultravioleta. Os 3 grupos que não apresentavam filtros de ultravioleta causaram uma queda abrupta na transmissão da radiação ultravioleta abaixo de 240 nm, ocorrendo um bloqueio completo de transmissão abaixo de 220 nm. CONCLUSÃO: As lentes de contato sem filtro Uv testadas não bloquearam com eficácia a radiação Uv-A, B ou C, e as com filtro bloquearam quase totalmente a radiação Uv-B e parcialmente a radiação Uv-A e Uv-C.The exposure to ultraviolet radiation is associated with the beginning of ocular pathologies like keratites, cataract, age-related macular degeneration and pterygium. This radiation is divided in 3 bands according to the wave length: Uv-A (320-400, Uv-B (290-320, Uv-C (100-290. The optic industry developed ultraviolet filters to intraocular lenses, contact lenses and spectacle lenses. PURPOSE: The issue of this work is

High-throughput fabrication of anti-counterfeiting colloid-based photoluminescent microtags using electrical nanoimprint lithography

International Nuclear Information System (INIS)

Diaz, R; Palleau, E; Poirot, D; Sangeetha, N M; Ressier, L

2014-01-01

This work demonstrates the excellent capability of the recently developed electrical nanoimprint lithography (e-NIL) technique for quick, high-throughput production of well-defined colloid assemblies on surfaces. This is shown by fabricating micron-sized photoluminescent quick response (QR) codes based on the electrostatic directed trapping (so called nanoxerography process) of 28 nm colloidal lanthanide-doped upconverting NaYF 4 nanocrystals. Influencing experimental parameters have been optimized and the contribution of triboelectrification in e-NIL was evidenced. Under the chosen conditions, more than 300 000 nanocrystal-based QR codes were fabricated on a 4 inch silicon wafer, in less than 15 min. These microtags were then transferred to transparent flexible films, to be easily integrated onto desired products. Invisible to the naked eye, they can be decoded and authenticated using an optical microscopy image of their specific photoluminescence mapping. Beyond this very promising application for product tracking and the anti-counterfeiting strategies, e-NIL nanoxerography, potentially applicable to any types of charged and/or polarizable colloids and pattern geometries opens up tremendous opportunities for industrial scale production of various other kinds of colloid-based devices and sensors. (paper)

Stacking metal nano-patterns and fabrication of moth-eye structure

Science.gov (United States)

Taniguchi, Jun

2018-01-01

Nanoimprint lithography (NIL) can be used as a tool for three-dimensional nanoscale fabrication. In particular, complex metal pattern structures in polymer material are demanded as plasmonic effect devices and metamaterials. To fabricate of metallic color filter, we used silver ink and NIL techniques. Metallic color filter was composed of stacking of nanoscale silver disc patterns and polymer layers, thus, controlling of polymer layer thickness is necessary. To control of thickness of polymer layer, we used spin-coating of UV-curable polymer and NIL. As a result, ten stacking layers with 1000 nm layer thickness was obtained and red color was observed. Ultraviolet nanoimprint lithography (UV-NIL) is the most effective technique for mass fabrication of antireflection structure (ARS) films. For the use of ARS films in mobile phones and tablet PCs, which are touch-screen devices, it is important to protect the films from fingerprints and dust. In addition, as the nanoscale ARS that is touched by the hand is fragile, it is very important to obtain a high abrasion resistance. To solve these problems, a UV-curable epoxy resin has been developed that exhibits antifouling properties and high hardness. The high abrasion resistance ARS films are shown to withstand a load of 250 g/cm2 in the steel wool scratch test, and the reflectance is less than 0.4%.

Wettability properties of PTFE/ZnO nanorods thin film exhibiting UV-resilient superhydrophobicity

International Nuclear Information System (INIS)

Bayat, A.; Ebrahimi, M.; Nourmohammadi, A.; Moshfegh, A.Z.

2015-01-01

Highlights: • Thin layer of Teflon was deposited on ZnO nanorods using RF sputtering technique. • Water contact angle was measured from 3° for ZnO to 160° for the PTFE/ZnO. • Very low contact angle hysteresis of ∼2° and sliding angle of ∼1° was measured. • Excellent stability under UV illumination was observed for the PTFE/ZnO sample. • We have proposed a model to describe wettability property supporting our data. - Abstract: In this research, initially anodization process was used to fabricate ZnO nanorods on Zn substrate and then RF sputtering technique was applied to grow a thin layer of polytetrafluoroethylene (PTFE, Teflon) on the coated ZnO nanorods for producing a superhydrophobic surface. According to scanning electron microscopy (SEM) observations, ZnO nanorods were formed with average diameter and length of about ∼180 nm and 14 μm, respectively. Superhydrophilic property of ZnO nanorods and superhydrophobic property of PTFE/ZnO nanorods was investigated by water contact angle (WCA) measurements. It was found that the contact angle varied with the PTFE deposition time. The highest contact angle measurement was obtained at 160° for the PTFE (60 min coating)/ZnO as optimum sample which indicates its superhydrophobic property. X-ray photoelectron spectroscopy (XPS) determined surface chemical composition and F/C ratio of about 1.27 for this sample. A change of water contact angle from 3° to 160° indicates transition from superhydrophilic to superhydrophobic state. Very low contact angle hysteresis (CAH) of ∼2° and sliding angle (SA) of ∼1° as well as unchanged contact angle under UV illumination was observed for the synthesized optimum PTFE/ZnO sample exhibits an excellent superhydrophobic property. Based on our data analysis, the ZnO nanorods and the PTFE/ZnO nanorods obey Wenzel and Cassie–Baxter model, respectively

New Results on Plasma Activated Bonding of Imprinted Polymer Features for Bio MEMS Applications

International Nuclear Information System (INIS)

Kettner, P; Pelzer, R L; Glinsner, T; Farrens, S; Lee, D

2006-01-01

Nanoimprint Lithography is a well-acknowledged low cost, high resolution, large area 3D patterning process for polymers. It includes the most promising methods: high pressure hot embossing (HE) and UV-Nanoimprint Lithography (UV-NIL). Curing of the imprinted structures is either done by cooling down below the glass transition temperature of the thermoplastic polymer in case of HE or by subsequent UV-light exposure and cross-linking in case of UV-NIL. Both techniques allow rapid prototyping for high volume production of fully patterned substrates for a wide range of materials. The advantages of using polymer substrates over common Micro-Electro-Mechanical Systems (MEMS) processing materials like glass, silicon or quartz are: bio-compatible surfaces, easy manufacturability, low cost for high volume production, suitable for use in micro- and nano-fabrication, low conductivity, wide range of optical properties just to name a few. We will present experimental results on HE processes with PMMA as well as UV-NIL imprints in selected UV-curable resists. In the second part of the work we will describe the bonding techniques for packaging of the micro or nano structures. Packaging of the imprinted features is a key technology for a wide variety of field of applications: μ-TAS, biochemistry, micro-mixers, micro-reactors, electrophoresis cells, life science, micro-optical and nano-optical applications (switches) nanofluidics, data storage, etc. for features down to sub-100 nm range. Most bonding techniques for polymer use adhesives as intermediate layers. We will demonstrate a promising technique for dense and very strong bonds using plasma activation of polymers and glass. This bonding technology allows for bonding at low temperatures well below the glass transition temperature of the polymers, which will ensure that the structures are not deformed

Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation

International Nuclear Information System (INIS)

Xie Yue-Hong; Xu Jian-Gang; Zhang Yun-Guang; Song Hai-Yang

2015-01-01

The effects of a twin boundary (TB) on the mechanical properties of two types of bicrystal Al thin films during the nanoimprint process are investigated by using molecular dynamics simulations. The results indicate that for the TB direction parallel to the imprinting direction, the yield stress reaches the maximum for the initial dislocation nucleation when the mould directly imprints to the TB, and the yield stress first decreases with the increase of the marker interval and then increases. However, for the TB direction perpendicular to the imprinting direction, the effect of the TB location to the imprinting forces is very small, and the yield stress is greater than that with the TB direction parallel to the imprinting direction. The results also demonstrate that the direction of the slip dislocations and the deformation of the thin film caused by spring-back are different due to various positions and directions of the TB. (paper)

Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers

International Nuclear Information System (INIS)

Simão, Claudia; Khunsin, Worawut; Kehagias, Nikolaos; Sotomayor Torres, Clivia M; Salaun, Mathieu; Zelsmann, Marc; Morris, Michael A

2014-01-01

Directed self-assembly of block copolymer polystyrene-b-polyethylene oxide (PS-b-PEO) thin film was achieved by a one-pot methodology of solvent vapor assisted nanoimprint lithography (SAIL). Simultaneous solvent-anneal and imprinting of a PS-b-PEO thin film on silicon without surface pre-treatments yielded a 250 nm line grating decorated with 20 nm diameter nanodots array over a large surface area of up to 4′ wafer scale. The grazing-incidence small-angle x-ray scattering diffraction pattern showed the fidelity of the NIL stamp pattern replication and confirmed the periodicity of the BCP of 40 nm. The order of the hexagonally arranged nanodot lattice was quantified by SEM image analysis using the opposite partner method and compared to conventionally solvent-annealed block copolymer films. The imprint-based SAIL methodology thus demonstrated an improvement in ordering of the nanodot lattice of up to 50%, and allows significant time and cost reduction in the processing of these structures. (papers)

Reversible manipulation of the adhesive forces of TiO{sub 2}/polybenzoxazine nanoassembled coatings through UV irradiation and thermal treatment

Energy Technology Data Exchange (ETDEWEB)

Wang, Sheng-Feng; Kao, Tzu-Hao [Department of Materials Science and Engineering, National Taiwan University of Science and Technology, 43, Section 4, Keelung Road, Taipei 106, Taiwan, ROC (China); Cheng, Chih-Chia [Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei 10607, Taiwan, ROC (China); Chang, Chi-Jung [Department of Chemical Engineering, Feng Chia University, 100, Wenhwa Road, Seatwen, Taichung 40724, Taiwan, ROC (China); Chen, Jem-Kun, E-mail: jkchen@mail.ntust.edu.tw [Department of Materials Science and Engineering, National Taiwan University of Science and Technology, 43, Section 4, Keelung Road, Taipei 106, Taiwan, ROC (China)

2015-12-01

Graphical abstract: We developed a simple approach, mixing TiO{sub 2} nanoparticles and 3-phenyl-3,4-dihydro-2H-1,3-benzoxazine (BA), to obtain a UV-responsive surfaces after thermal treatment. Because the wettability between TiO{sub 2} nanoparticles and BA, a nanoassembled structure was generated on the surface during the coating process. Results indicate that the mixing 30 wt% TiO{sub 2} nanoparticles into PBA matrix generated the superhydrophobic surface (static water contact angle > 150°) with ca. 1° of sliding angle. The superhydrophobic TiO{sub 2}/PBA nanoassembled surface can be converted by photocatalytic oxidation into a highly hydrophilic one (static water contact angle ∼ 0°) within five minimums. Interestingly, the hydrophilic surface can be converted back into a superhydrophobic surface by heat treatment. A water droplet can be transported among the surfaces that UV-irradiated for various times. Velocity of the droplet on the 15°-titled surface could be also manipulated with UV irradiation for various times. The correlations between PBA and TiO{sub 2} nanoparticles would provide insight into the designing and developing of light-responsive surfaces. - Highlights: • Nanoassembly of PBA and TiO{sub 2} NPs are generated with superhydrophobicity. • The superhydrophobicity can be converted to hydrophilic surface within 5 min. • The hydrophilic surface can be converted back into a superhydrophobic surface. • Adhesive force of the nanoassemblies can be manipulated by UV illumination time. - Abstract: In this study we mixed TiO{sub 2} nanoparticles (NPs) with 3-phenyl-3,4-dihydro-2H-1,3-benzoxazine (BA), as a precursor to a polybenzoxazine (PBA), to generate nanocomposite surfaces possessing low surface free energies. Because of extreme phase separation between the TiO{sub 2} NPs and BA, their mixtures featured nanoassembled structures on their surfaces. After thermal curing, we obtained PBA/TiO{sub 2} nanoassembled (PTN) surfaces possessing

coating layers under the UV loading

Directory of Open Access Journals (Sweden)

Kulhavý Petr

2017-01-01

Full Text Available For individual components as well as for the final products is need to determine their resistance and other mechanical properties, which can be changing due to the various conditions and simultaneously we try to get still closer to the real operating conditions.Currently, given the need to guarantee a perfect quality of the product throughout its entire life cycle, it is necessary to assess the protective layers that are in direct contact with the material itself or with the future products.This article presents the results of testing individual components of the selected materials and their resistance to the UV rays. These were some samples of a prelacquered sheet and a powder coated plate after their forming, next by pigment colored concrete cubes, artificial wood and a prototype sample of the translucent material Licrete. Compared to a conventional climate tests such as heat, cold, humidity or the salt chambers, the colored protection layers were subjected to a strong UV rays. Subsequently was evaluated the change of the colors, brightness and where it was possible also the adhesion parameters and thickness of the coated layer. The measurement wasn’t focused only on the adhesion and color stability, but also to a violation of microstructure due to high temperatures caused by the UV ray. The selected specimens were tested in a device which simulates solar radiation and then were them evaluated the changes of a colors and on the surface structure.

Fabrication of Robust Super hydrophobic Bamboo Based on ZnO Nano sheet Networks with Improved Water-, UV-, and Fire-Resistant Properties

International Nuclear Information System (INIS)

Li, J.; Sun, Q.; Yao, Q.; Wang, J.; Han, Sh.; Jin, Ch.

2014-01-01

Bamboo with water-resistant, UV-resistant, and fire-resistant properties was desirable in modern society. In this paper, the original bamboo was firstly treated with ZnO sol and then hydrothermally the ZnO nano sheet networks grow onto the bamboo surface and subsequently modified with fluoro alkyl silane (FAS-17). The FAS-17 treated bamboo substrate exhibited not only robust super hydrophobicity with a high contact angle of 161° but also stable repellency towards simulated acid rain (ph = 3) with a contact angle of 152°. Except for its robust super hydrophobicity, such a bamboo also presents superior water-resistant, UV-resistant, and fire-resistant properties.

Improved sensing characteristics of dual-gate transistor sensor using silicon nanowire arrays defined by nanoimprint lithography

Science.gov (United States)

Lim, Cheol-Min; Lee, In-Kyu; Lee, Ki Joong; Oh, Young Kyoung; Shin, Yong-Beom; Cho, Won-Ju

2017-12-01

This work describes the construction of a sensitive, stable, and label-free sensor based on a dual-gate field-effect transistor (DG FET), in which uniformly distributed and size-controlled silicon nanowire (SiNW) arrays by nanoimprint lithography act as conductor channels. Compared to previous DG FETs with a planar-type silicon channel layer, the constructed SiNW DG FETs exhibited superior electrical properties including a higher capacitive-coupling ratio of 18.0 and a lower off-state leakage current under high-temperature stress. In addition, while the conventional planar single-gate (SG) FET- and planar DG FET-based pH sensors showed the sensitivities of 56.7 mV/pH and 439.3 mV/pH, respectively, the SiNW DG FET-based pH sensors showed not only a higher sensitivity of 984.1 mV/pH, but also a lower drift rate of 0.8% for pH-sensitivity. This demonstrates that the SiNW DG FETs simultaneously achieve high sensitivity and stability, with significant potential for future biosensing applications.

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

Science.gov (United States)

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jaewon; Huang, Caili; Jeong, Gajin; Coughlin, E Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y; Kuo, David S; Xiao, Shuaigang; Russell, Thomas P

2015-08-05

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Effects of Relative Humidity and Spraying Medium on Ultraviolet (UV) Decontamination of Filters Loaded with Viral Aerosols

Science.gov (United States)

2012-02-01

as can chloramines (F. J. Madeline, personal communication). The use of direct microwave irradiation to kill microorganisms through thermal and...transmission modes as a function of UV irradiation time in different nebulizer media. UV Disinfection of Filters August 2012 Volume 78 Number 16 aem.asm.org...at contact. The equation for evaporation time is the following (11): tevaporation time Rpdd 2 8DvM pdTd p T (2) where R is the ideal gas law

Optical properties of photodetectors based on single GaN nanowires with a transparent graphene contact

Energy Technology Data Exchange (ETDEWEB)

Babichev, A. V., E-mail: A.Babichev@mail.ioffe.ru [Russian Academy of Sciences, Ioffe Institute (Russian Federation); Zhang, H.; Guan, N. [University Paris Saclay, Institut d’Electronique Fondamentale, UMR 8622 CNRS (France); Egorov, A. Yu. [ITMO University (Russian Federation); Julien, F. H.; Messanvi, A. [University Paris Saclay, Institut d’Electronique Fondamentale, UMR 8622 CNRS (France); Durand, C.; Eymery, J. [University Grenoble Alpes (France); Tchernycheva, M. [University Paris Saclay, Institut d’Electronique Fondamentale, UMR 8622 CNRS (France)

2016-08-15

We report the fabrication and optical and electrical characterization of photodetectors for the UV spectral range based on single p–n junction nanowires with a transparent contact of a new type. The contact is based on CVD-grown (chemical-vapor deposition) graphene. The active region of the nitride nanowires contains a set of 30 radial In{sub 0.18}Ga{sub 0.82}N/GaN quantum wells. The structure is grown by metal-organic vaporphase epitaxy. The photodetectors are fabricated using electron-beam lithography. The current–voltage characteristics exhibit a rectifying behavior. The spectral sensitivity of the photodetector is recorded starting from 3 eV and extending far in the UV range. The maximal photoresponse is observed at a wavelength of 367 nm (sensitivity 1.9 mA/W). The response switching time of the photodetector is less than 0.1 s.

Functional Analysis in Long-Term Operation of High Power UV-LEDs in Continuous Fluoro-Sensing Systems for Hydrocarbon Pollution

Science.gov (United States)

Arques-Orobon, Francisco Jose; Nuñez, Neftali; Vazquez, Manuel; Gonzalez-Posadas, Vicente

2016-01-01

This work analyzes the long-term functionality of HP (High-power) UV-LEDs (Ultraviolet Light Emitting Diodes) as the exciting light source in non-contact, continuous 24/7 real-time fluoro-sensing pollutant identification in inland water. Fluorescence is an effective alternative in the detection and identification of hydrocarbons. The HP UV-LEDs are more advantageous than classical light sources (xenon and mercury lamps) and helps in the development of a low cost, non-contact, and compact system for continuous real-time fieldwork. This work analyzes the wavelength, output optical power, and the effects of viscosity, temperature of the water pollutants, and the functional consistency for long-term HP UV-LED working operation. To accomplish the latter, an analysis of the influence of two types 365 nm HP UV-LEDs degradation under two continuous real-system working mode conditions was done, by temperature Accelerated Life Tests (ALTs). These tests estimate the mean life under continuous working conditions of 6200 h and for cycled working conditions (30 s ON & 30 s OFF) of 66,000 h, over 7 years of 24/7 operating life of hydrocarbon pollution monitoring. In addition, the durability in the face of the internal and external parameter system variations is evaluated. PMID:26927113

Sterilization of swine wastewater treated by anaerobic reactors using UV photo-reactors

Directory of Open Access Journals (Sweden)

Erlon Lopes Pereira

2014-09-01

Full Text Available The use of ultraviolet radiation is an established procedure with growing application forthe disinfection of contaminated wastewater. This study aimed to evaluate the efficiency of artificial UV radiation, as a post treatment of liquid from anaerobic reactors treating swine effluent. The UV reactors were employed to sterilize pathogenic microorganisms. To this end, two photo-reactors were constructed using PVC pipe with100 mm diameter and 1060 mmlength, whose ends were sealed with PVC caps. The photo-reactors were designed to act on the liquid surface, as the lamp does not get into contact with the liquid. To increase the efficiency of UV radiation, photo-reactors were coated with aluminum foil. The lamp used in the reactors was germicidal fluorescent, with band wavelength of 230 nm, power of 30 Watts and manufactured by Techlux. In this research, the HRT with the highest removal efficiency was 0.063 days (90.6 minutes, even treating an effluent with veryhigh turbidity due to dissolved solids. It was concluded that the sterilization method using UV has proved to be an effective and appropriate process, among many other procedures.

Diurnal changes in epidermal UV transmittance of plants in naturally high UV environments.

Science.gov (United States)

Barnes, Paul W; Flint, Stephan D; Slusser, James R; Gao, Wei; Ryel, Ronald J

2008-06-01

Studies were conducted on three herbaceous plant species growing in naturally high solar UV environments in the subalpine of Mauna Kea, Hawaii, USA, to determine if diurnal changes in epidermal UV transmittance (T(UV)) occur in these species, and to test whether manipulation of the solar radiation regime could alter these diurnal patterns. Additional field studies were conducted at Logan, Utah, USA, to determine if solar UV was causing diurnal T(UV) changes and to evaluate the relationship between diurnal changes in T(UV) and UV-absorbing pigments. Under clear skies, T(UV), as measured with a UV-A-pulse amplitude modulation fluorometer for leaves of Verbascum thapsus and Oenothera stricta growing in native soils and Vicia faba growing in pots, was highest at predawn and sunset and lowest at midday. These patterns in T(UV) closely tracked diurnal changes in solar radiation and were the result of correlated changes in fluorescence induced by UV-A and blue radiation but not photochemical efficiency (F(v)/F(m)) or initial fluorescence yield (F(o)). The magnitude of the midday reduction in T(UV) was greater for young leaves than for older leaves of Verbascum. Imposition of artificial shade eliminated the diurnal changes in T(UV) in Verbascum, but reduction in solar UV had no effect on diurnal T(UV) changes in Vicia. In Vicia, the diurnal changes in T(UV) occurred without detectable changes in the concentration of whole-leaf UV-absorbing compounds. Results suggest that plants actively control diurnal changes in UV shielding, and these changes occur in response to signals other than solar UV; however, the underlying mechanisms responsible for rapid changes in T(UV) remain unclear.

Response surface methodology as a tool for modeling and optimization of Bacillus subtilis spores inactivation by UV/ nano-Fe0 process for safe water production.

Science.gov (United States)

Yousefzadeh, Samira; Matin, Atiyeh Rajabi; Ahmadi, Ehsan; Sabeti, Zahra; Alimohammadi, Mahmood; Aslani, Hassan; Nabizadeh, Ramin

2018-04-01

One of the most important aspects of environmental issues is the demand for clean and safe water. Meanwhile, disinfection process is one of the most important steps in safe water production. The present study aims at estimating the performance of UV, nano Zero-Valent Iron particles (nZVI, nano-Fe 0 ), and UV treatment with the addition of nZVI (combined process) for Bacillus subtilis spores inactivation. Effects of different factors on inactivation including contact time, initial nZVI concentration, UV irradiance and various aerations conditions were investigated. Response surface methodology, based on a five-level, two variable central composite design, was used to optimize target microorganism reduction and the experimental parameters. The results indicated that the disinfection time had the greatest positive impact on disinfection ability among the different selected independent variables. According to the results, it can be concluded that microbial reduction by UV alone was more effective than nZVI while the combined UV/nZVI process demonstrated the maximum log reduction. The optimum reduction of about 4 logs was observed at 491 mg/L of nZVI and 60 min of contact time when spores were exposed to UV radiation under deaerated condition. Therefore, UV/nZVI process can be suggested as a reliable method for Bacillus subtilis spores inactivation. Copyright © 2018. Published by Elsevier Ltd.

Multilayered Magnetic Nanoparticles Fabricated by Nanoimprint Lithography for Magnetomechanical Treatment of Cancer

Science.gov (United States)

Kwon, Byung Seok

Fe3O4-magetite nanoparticles have received wide interest as prominent agents for various biomedical applications, ranging from target-specific cancer treatment, gene therapy, and Magnetic Particle Imaging (MPI). However, Fe3O4-magnetite nanoparticles, synthesized by chemical methods beyond a certain size, present challenges in controlling size distribution and shape. Similarly, Fe3O 4-magnetite nanoparticles fabricated by conventional top-down lithographic methods present difficulty of controlling defects and lead to agglomeration due to large size. In order to overcome the difficulties associated with the conventional chemical and top-down lithographic methods, it is critical to develop a fabrication method which produces homogeneous nanoparticles in large quantities with the control of size, defects, and structure. Furthermore, the concept of cell death induced by mechanical perturbation has received wide attention as a way to maximize the cancer cell death with minimal side effects. Previous study has proposed the use of permalloy disk-shaped vortex state microparticles, in order to create cancer cell death by mechanical force. However, insufficient biocompatibility, inadequate mechanical force created by vortex switching, and inability to control the particle size have been critical issues to be further researched and proceeded for in vivo application. Hence, we studied physical and magnetic properties of Fe3O 4 as a material in thin film form and proceeded to develop Fe3 O4 based synthetic antiferromagnetic (SAF) thin films. Then, we combined these favorable physical/magnetic properties with nanoimprint lithography to fabricate homogeneously patterned synthetic antiferromagnetic (SAF) nanoparticles (wafer area >1 x 1 cm2) with the control of size, shape and structure. Then we demonstrated the release of these particles in an aqueous environment. The fabrication process combines a tetrafluoroethylene (ETFE) "working stamp", a bi-layer resist lift-off, defect

Ecotoxicological effect characterisation of widely used organic UV filters

International Nuclear Information System (INIS)

Kaiser, D.; Sieratowicz, A.; Zielke, H.; Oetken, M.; Hollert, H.; Oehlmann, J.

2012-01-01

Chemical UV filters are used in sun protection and personal care products in order to protect consumers from skin cancer induced by ultraviolet (UV) radiation. The present study aims to evaluate the effects of three common UV filters butyl-methoxydibenzoylmethane (B-MDM) ethylhexyl-methoxycinnamate (EHMC) and octocrylene (OCR) on aquatic organism, focussing particularly on infaunal and epibentic invertebrates (Chironomus riparius, Lumbriculus variegatus, Melanoides tuberculata and Potamopyrgus antipodarum). Due to their life habits, these organism are especially affected by lipophilic substances. Additionally, two direct sediment contact assays utilising zebra fish (Danio rerio) embryos and bacteria (Arthrobacter globiformis) were conducted. EHMC caused a toxic effect on reproduction in both snails with lowest observed effect concentrations (LOEC) of 0.4 mg/kg (Potamopyrgus antipodarum) and 10 mg/kg (Melanoides tuberculata). At high concentrations sublethal effects could be observed for D. rerio after exposure to EHMC (NOEC 100 mg/kg). B-MDM and OCR showed no effects on any of the tested organism. - Highlights: ► Ecotoxicological effects of common used UV filters on aquatic invertebrates. ► Butyl-methoxydibenzoylmethane, ethylhexyl-methoxycinnamate, and octocrylene used. ► Sediment based test systems. ► Ethylhexyl-methoxycinnamate caused a toxic effect on reproduction in both snails. ► Other substances showed no effects on any of the tested organism. - Ethylhexyl-methoxycinnamate caused a toxic effect on reproduction in both snails. Butyl-methoxydibenzoylmethane and octocrylene showed no effects on any of the tested organism.

A Class I UV-blocking (senofilcon A) soft contact lens prevents UVA-induced yellow fluorescence and NADH loss in the rabbit lens nucleus in vivo.

Science.gov (United States)

Giblin, Frank J; Lin, Li-Ren; Simpanya, Mukoma F; Leverenz, Victor R; Fick, Catherine E

2012-09-01

It is known that fluorescence, much of it caused by UVA light excitation, increases in the aging human lens, resulting in loss of sharp vision. This study used an in vivo animal model to investigate UVA-excited fluorescence in the rabbit lens, which contains a high level of the UVA chromophore NADH, existing both free and bound to λ-crystallin. Also, the ability of a Class I (senofilcon A) soft contact lens to protect against UVA-induced effects on the rabbit lens was tested. Rabbit eyes were irradiated with UVA light in vivo (100 mW/cm(2) on the cornea) for 1 h using monochromatic 365 nm light. Irradiation was conducted in the presence of either a senofilcon A contact lens, a minimally UV-absorbing lotrafilcon A contact lens, or no contact lens at all. Eyes irradiated without a contact lens showed blue 365 nm-excited fluorescence initially, but this changed to intense yellow fluorescence after 1 h. Isolated, previously irradiated lenses exhibited yellow fluorescence originating from the lens nucleus when viewed under 365 nm light, but showed normal blue fluorescence arising from the cortex. Previously irradiated lenses also exhibited a faint yellow color when observed under visible light. The senofilcon A contact lens protected completely against the UVA-induced effects on fluorescence and lens yellowing, whereas the lotrafilcon A lens showed no protection. The UVA-exposure also produced a 53% loss of total NADH (free plus bound) in the lens nucleus, with only a 13% drop in the anterior cortex. NADH loss in the nucleus was completely prevented with use of a senofilcon A contact lens, but no significant protection was observed with a lotrafilcon A lens. Overall, the senofilcon A lens provided an average of 67% protection against UVA-induced loss of four pyridine nucleotides in four different regions of the lens. HPLC analysis with fluorescence detection indicated a nearly six-fold increase in 365 nm-excited yellow fluorescence arising from lens nuclear �

UV-Induced [2+2] Grafting-To Reactions for Polymer Modification of Cellulose.

Science.gov (United States)

Conradi, Matthias; Ramakers, Gijs; Junkers, Thomas

2016-01-01

Benzaldehyde-functional cellulose paper sheets have been synthesized via tosylation of cellulose (Whatman No 5) followed by addition of p-hydroxy benzaldehyde. Via UV-induced Paterno-Büchi [2+2] cycloaddition reactions, these aldehyde functional surfaces are grafted with triallylcyanurate, trimethylolpropane allyl ether, and vinyl chloroacetate. In the following, allyl-functional polymers (poly(butyl acrylate), pBA, Mn = 6990 g mol(-1) , Đ = 1.12 and poly(N-isopropyl acrylamide), pNIPAAm, Mn = 9500 g mol(-1) , Đ = 1.16) synthesized via reversible addition fragmentation chain transfer polymerization are conjugated to the celloluse surface in a UV-induced grafting-to approach. With pBA, hydrophobic cellulose sheets are obtained (water contact angle 116°), while grafting of pNIPAAm allows for generation of "smart" surfaces, which are hydrophilic at room temperature, but that become hydrophobic when heated above the characteristic lower critical solution temperature (93° contact angle). The Paterno-Büchi reaction has been shown to be a versatile synthetic tool that also performs well in grafting-to approaches whereby its overall performance seems to be close to that of radical thiol-ene reactions. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Integration of active and passive polymer optics

DEFF Research Database (Denmark)

Christiansen, Mads Brøkner; Schøler, Mikkel; Kristensen, Anders

2007-01-01

We demonstrate a wafer scale fabrication process for integration of active and passive polymer optics: Polymer DFB lasers and waveguides. Polymer dye DFB lasers are fabricated by combined nanoimprint and photolithography (CNP). The CNP fabrication relies on an UV transparent stamp with nm sized...... wavelength from temperature and refractive index changes in the surroundings is investigated, pointing towards the use of the described fabrication method for on-chip polymer sensor systems....

Degradation study of different brands of paracetamol by UV spectroscopy

Directory of Open Access Journals (Sweden)

Safila Naveed

2016-05-01

Full Text Available Objective: To investgate the forced degradation study for the determination of degradation of the drug substance. Methods: Paracetamol was exposed to different conditions according to International Conference on Harmonization guideline. The amount of degradation product can be calculated with the help of UV spectrophotometer. The official test limits according to British Pharmacopoeia/United States Pharmacopoeia should not less than and should not more than lapelled amount. Forced degradation of drug substance was exposed to acidic and basic medium of panadol. Forced degradation of drug substance of panadol, disprol and calpol were also observed negligible difference in availability on exposure to UV and heat. This method can be used successfully for studying the stress degradation factors. Because this method is less time consuming and simple and cost effective also. Results: The brands i.e. calpol, panadol and disprol, when they come in contact with different degradation parameters (before, acid, base, heat and UV treatments according to statistical analysis, the result showed significant values (P < 0.05 which indicated that there was no degradation in any of the brand. Conclusions: The result indicated there is no degradation found in these brands.

Plant responses to UV-B irradiation are modified by UV-A irradiation

International Nuclear Information System (INIS)

Middleton, E.M.; Teramura, A.H.

1993-01-01

The increasing UV-B radiation (0.28-0.32 μm) reaching the earth's surface is an important concern. Plant response in artificial UV-B irradiation studies has been difficult to assess, especially regarding photosynthetic pigments, because the fluorescent lamps also produce UV-A (0.32-0.40μm) radiation which is involved with blue light in pigment synthesis. Both UV-A and UV-B irradiances were controlled in two glasshouse experiments conducted under relatively high PPFD (> 1300μmol m -2 s -1 ) at two biologically effective daily UV-B irradiances (10.7 and 14.1 kJ m -2 ); UV-A irradiances were matched in Controls (∼5, 9 kJ m -2 ). Normal, chlorophyll-deficient, and flavonoid-deficient isolines of soybean cultivar, Clark, were utilized. Many growth/ pigment variables exhibited a statistically significant interaction between light quality and quantity: in general, UV-A radiation moderated the damaging effects of UV-B radiation. Regression analyses demonstrated that a single negative function related photosynthetic efficiency to carotenoid Content (r 2 =0.73, P≤0.001), implying a open-quotes costclose quotes in maintaining carotenoids for photoprotection. A stomatal limitation to photosynthesis was verified and carotenoid content was correlated with UV-B absorbing compound levels, in UV-B irradiated plants

Mesoscopic Oxide Double Layer as Electron Specific Contact for Highly Efficient and UV Stable Perovskite Photovoltaics.

Science.gov (United States)

Tavakoli, Mohammad Mahdi; Giordano, Fabrizio; Zakeeruddin, Shaik Mohammed; Grätzel, Michael

2018-04-11

The solar to electric power conversion efficiency (PCE) of perovskite solar cells (PSCs) has recently reached 22.7%, exceeding that of competing thin film photovoltaics and the market leader polycrystalline silicon. Further augmentation of the PCE toward the Shockley-Queisser limit of 33.5% warrants suppression of radiationless carrier recombination by judicious engineering of the interface between the light harvesting perovskite and the charge carrier extraction layers. Here, we introduce a mesoscopic oxide double layer as electron selective contact consisting of a scaffold of TiO 2 nanoparticles covered by a thin film of SnO 2 , either in amorphous (a-SnO 2 ), crystalline (c-SnO 2 ), or nanocrystalline (quantum dot) form (SnO 2 -NC). We find that the band gap of a-SnO 2 is larger than that of the crystalline (tetragonal) polymorph leading to a corresponding lift in its conduction band edge energy which aligns it perfectly with the conduction band edge of both the triple cation perovskite and the TiO 2 scaffold. This enables very fast electron extraction from the light perovskite, suppressing the notorious hysteresis in the current-voltage ( J-V) curves and retarding nonradiative charge carrier recombination. As a result, we gain a remarkable 170 mV in open circuit photovoltage ( V oc ) by replacing the crystalline SnO 2 by an amorphous phase. Because of the quantum size effect, the band gap of our SnO 2 -NC particles is larger than that of bulk SnO 2 causing their conduction band edge to shift also to a higher energy thereby increasing the V oc . However, for SnO 2 -NC there remains a barrier for electron injection into the TiO 2 scaffold decreasing the fill factor of the device and lowering the PCE. Introducing the a-SnO 2 coated mp-TiO 2 scaffold as electron extraction layer not only increases the V oc and PEC of the solar cells but also render them resistant to UV light which forebodes well for outdoor deployment of these new PSC architectures.

Microbial UV fluence-response assessment using a novel UV-LED collimated beam system.

Science.gov (United States)

Bowker, Colleen; Sain, Amanda; Shatalov, Max; Ducoste, Joel

2011-02-01

A research study has been performed to determine the ultraviolet (UV) fluence-response of several target non-pathogenic microorganisms to UV light emitting diodes (UV-LEDs) by performing collimated beam tests. UV-LEDs do not contain toxic mercury, offer design flexibility due to their small size, and have a longer operational life than mercury lamps. Comsol Multiphysics was utilized to create an optimal UV-LED collimated beam design based on number and spacing of UV-LEDs and distance of the sample from the light source while minimizing the overall cost. The optimized UV-LED collimated beam apparatus and a low-pressure mercury lamp collimated beam apparatus were used to determine the UV fluence-response of three surrogate microorganisms (Escherichia coli, MS-2, T7) to 255 nm UV-LEDs, 275 nm UV-LEDs, and 254 nm low-pressure mercury lamps. Irradiation by low-pressure mercury lamps produced greater E. coli and MS-2 inactivation than 255 nm and 275 nm UV-LEDs and similar T7 inactivation to irradiation by 275 nm UV-LEDs. The 275 nm UV-LEDs produced more efficient T7 and E. coli inactivation than 255 nm UV-LEDs while both 255 nm and 275 nm UV-LEDs produced comparable microbial inactivation for MS-2. Differences may have been caused by a departure from the time-dose reciprocity law due to microbial repair mechanisms. Copyright © 2010 Elsevier Ltd. All rights reserved.

Biobased Nanoparticles for Broadband UV Protection with Photostabilized UV Filters

NARCIS (Netherlands)

Hayden, D.R.|info:eu-repo/dai/nl/412640694; Imhof, A.|info:eu-repo/dai/nl/145641600; Velikov, K. P.|info:eu-repo/dai/nl/239483472

2016-01-01

Sunscreens rely on multiple compounds to provide effective and safe protection against UV radiation. UV filters in sunscreens, in particular, provide broadband UV protection but are heavily linked to adverse health effects due to the generation of carcinogenic skin-damaging reactive oxygen species

Nanostructured surfaces using thermal nanoimprint lithography: Applications in thin membrane technology, piezoelectric energy harvesting and tactile pressure sensing

Science.gov (United States)

Nabar, Bhargav Pradip

Nanoimprint lithography (NIL) is emerging as a viable contender for fabrication of large-scale arrays of 5-500 nm features. The work presented in this dissertation aims to leverage the advantages of NIL for realization of novel Nano Electro Mechanical Systems (NEMS). The first application is a nanoporous membrane blood oxygenator system. A fabrication process for realization of thin nanoporous membranes using thermal nanoimprint lithography is presented. Suspended silicon nitride membranes were fabricated by Low-Pressure Chemical Vapor Deposition (LPCVD) in conjunction with a potassium hydroxide-based bulk micromachining process. Nanoscale features were imprinted into a commercially available thermoplastic polymer resist using a pre-fabricated silicon mold. The pattern was reversed and transferred to a thin aluminum oxide layer by means of a novel two stage lift-off technique. The patterned aluminum oxide was used as an etch mask in a CHF3/He based reactive ion etch process to transfer the pattern to silicon nitride. Highly directional etch profiles with near vertical sidewalls and excellent Si3N4/Al2O3 etch selectivity was observed. One-micrometer-thick porous membranes with varying dimensions of 250x250 microm2 to 450x450 microm 2 and pore diameter of 400 nm have been engineered and evaluated. Results indicate that the membranes have consistent nanopore dimensions and precisely defined porosity, which makes them ideal as gas exchange interfaces in blood oxygenation systems as well as other applications such as dialysis. Additionally, bulk -- micromachined microfluidic channels have been developed for uniform, laminar blood flow with minimal cell trauma. NIL has been used for ordered growth of crystalline nanostructures for sensing and energy harvesting. Highly ordered arrays of crystalline ZnO nanorods have been fabricated using a polymer template patterned by thermal nanoimprint lithography, in conjunction with a low temperature hydrothermal growth process. Zinc

Demonstration of zero bias responsivity in MBE grown β-Ga2O3 lateral deep-UV photodetector

Science.gov (United States)

Singh Pratiyush, Anamika; Krishnamoorthy, Sriram; Kumar, Sandeep; Xia, Zhanbo; Muralidharan, Rangarajan; Rajan, Siddharth; Nath, Digbijoy N.

2018-06-01

We demonstrate zero-bias spectral responsivity in MBE-grown β-Ga2O3 planar UV-C detector with good linearity up to optical power density of 4.6 mW cm‑2. Devices with asymmetrical metal contacts were realized on 150 nm thick β-Ga2O3 films on sapphire. The device exhibited a spectral responsivity of 1.4 mA W‑1 at 255 nm under zero-bias condition, dark current UV-to-visible rejection ratio ∼105 at 5 V. The demonstrated UV-C detector exhibited an estimated high detectivity of 2.0 × 1012 Jones at 1 V and were found to be very stable and repeatable, suggesting its potential use for focal plane arrays.

Design and fabrication of spectrally selective emitter for thermophotovoltaic system by using nano-imprint lithography

Science.gov (United States)

Kim, Jong-Moo; Park, Keum-Hwan; Kim, Da-Som; Hwang, Bo-yeon; Kim, Sun-Kyung; Chae, Hee-Man; Ju, Byeong-Kwon; Kim, Young-Seok

2018-01-01

Thermophotovoltaic (TPV) systems have attracted attention as promising power generation systems that can directly convert the radiant energy produced by the combustion of fuel into electrical energy. However, there is a fundamental limit of their conversion efficiency due to the broadband distribution of the radiant spectrum. To overcome this problem, several spectrally selective thermal emitter technologies have been investigated, including the fabrication of photonic crystal (PhC) structures. In this paper, we present some design rules based on finite-a difference time-domain (FDTD) simulation results for tungsten (W) PhC emitter. The W 2D PhC was fabricated by a simple nano-imprint lithography (NIL) process, and inductive coupled plasma reactive ion etching (ICP-RIE) with an isotropic etching process, the benefits and parameters of which are presented. The fabricated W PhC emitter showed spectrally selective emission near the infrared wavelength range, and the optical properties varied depending on the size of the nano-patterns. The measured results of the fabricated prototype structure correspond well to the simulated values. Finally, compared with the performance of a flat W emitter, the total thermal emitter efficiency was almost 3.25 times better with the 2D W PhC structure.

COMPARATIVE ANALYSIS OF UV-C AND UV-B RADIATION INFLUENCE ON PLANT OBJECTS

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О. Міхєєв

2011-04-01

Full Text Available General aim of work – comparative research of temporal regularities of growth processes of pea,that was grown under normal conditions and with application of UV-C and UV-B irradiation ofstem part, and also detection of irradiation dose relations to parameter of root and stem part sproutsgrowth rate of Aronis pea. Research subject of UV-C and UV-B irradiation influence on dynamicsof plant growth parameters in each set of experiments was alteration of growth rate, pecularities ofgrowth dynamics in different conditions of experiment, detection of UV-C and UV-B irradiationdoses range, that stimulate or inhibit growth parameters of pea sprouts. The investigation resulted indetermination 1,3 times higher efficiency of UV-V irradiation comparing to UV-B irradiation.Reaction of root didn’t depend on the type of UV-radiation

DNA damage caused by UV- and near UV-irradiation

International Nuclear Information System (INIS)

Ohnishi, Takeo

1986-01-01

Much work with mutants deficient in DNA repair has been performed concerning UV-induced DNA damage under the condition where there is no artificial stimulation. In an attempt to infer the effects of solar wavelengths, the outcome of the work is discussed in terms of cellular radiation sensitivity, unscheduled DNA synthesis, and mutation induction, leading to the conclusion that some DNA damage occurs even by irradiation of the shorter wavelength light (270 - 315 nm) and is repaired by excision repair. It has been thought to date that pyrimidine dimer (PD) plays the most important role in UV-induced DNA damage, followed by (6 - 4) photoproducts. As for DNA damage induced by near UV irradiation, the yield of DNA single-strand breaks and of DNA-protein crosslinking, other than PD, is considered. The DNA-protein crosslinking has proved to be induced by irradiation at any wavelength of UV ranging from 260 to 425 nm. Near UV irradiation causes the inhibition of cell proliferation to take place. (Namekawa, K.)

Expression of UV-irradiated adenovirus in normal and UV-sensitive Chinese hamster ovary cells

International Nuclear Information System (INIS)

Rainbow, A.J.

1985-01-01

The chinese hamster ovary (CHO) cell mutants UV-20, UV-24, and UV-41 are abnormally sensitive to UV and harbour various defects lin their ability to repair cellular DNA. This study has examined the expression of UV-irradiated AD2 in these cells. HCR of UV-irradiated Ad2, as measured by viral structural antigen (Vag) formation or progeny production, was found to be similar for the normal and the UV-sensitive CHO strains. UV-irradiation of Ad2 (1200 J/m/sup 2/) resulted in a delay of Vag expression of 18 hours in normal human fibroblasts, which is thought to reflect the time required for removal of UV-induced lesions from the DNA before viral DNA synthesis can proceed. However, a similar UV-irradiation of Ad2 did not result in a delay of Vag expression for infection of CHO cells, suggesting that UV-induced lesions in Ad2 DNA do not inhibit its replication in CHO cells. These results indicate a fundamental difference in the processing of UV-irradiated AD2-DNA in CHO as compared to human cells

EXOSAT and IUE observations of contact binaries

International Nuclear Information System (INIS)

Vilhu, O.; Heise, J.; Laboratorium voor Ruimteonderzoek, Utrecht, Netherlands)

1986-01-01

EXOSAT observations are reported of the contact binaries W UMa, VW Cep, 44t Boo, XY Leo, and V566 Oph and the detached short-period RS CVn stars ER Vul and HD 209943. Complete X-ray light curves were obtained for W UMa, VW Cep and 44t Boo. Nearly simultaneous IUE observations of VW Cep provide important comparisons of the Mg II emission, the UV continuum, and the FES light curve, pointing to extra hot gas at phase 0.75. The observations indicate that contact binaries have highly structured (in temperature and geometry) and highly variable coronae, not preferentially connected with either of the component stars. The observed dips can be interpreted as due to cool absorbing clouds above localized X-ray emitting regions. For VW Cep, 44t Boo, and XY Leo there is evidence that the neck regions are sites for X-ray-emitting hot gas. 66 references

Índice UV

Science.gov (United States)

Información general sobre el Índice UV que proporciona un pronóstico del riesgo esperado de sobreexposición a la radiación ultravioleta (UV) del sol. El índice UV va acompañado de recomendaciones para protegerse del sol.

Spectral dependence of some UV-B and UV-C responses of Tetrahymena pyriformis irradiated with dye laser generated UV

International Nuclear Information System (INIS)

Calkins, John; Colley, Ed; Wheeler, John; Kentucky Univ., Lexington

1987-01-01

We have generated UV-B and UV-C radiations using a flashlamp driven tunable dye laser combined with frequency doubling crystals. Using this novel UV source, we have investigated lethality and its modification by growth phase, photoreactivation and caffeine in Tetrahymena pyriformis at 254 nm and from 260-315 nm in 5 nm steps. From the observed responses we have constructed action spectra for lethality, with or without caffeine (a repair inhibitor) and under conditions of photoreactivation. We have also estimated quantum efficiencies for these responses. Our observations suggest that complex changes in response occur at several wavelengths over the UV-C and UV-B regions. (author)

Characteristics and fate of natural organic matter during UV oxidation processes.

Science.gov (United States)

Ahn, Yongtae; Lee, Doorae; Kwon, Minhwan; Choi, Il-Hwan; Nam, Seong-Nam; Kang, Joon-Wun

2017-10-01

Advanced oxidation processes (AOPs) are widely used in water treatments. During oxidation processes, natural organic matter (NOM) is modified and broken down into smaller compounds that affect the characteristics of the oxidized NOM by AOPs. In this study, NOM was characterized and monitored in the UV/hydrogen peroxide (H 2 O 2 ) and UV/persulfate (PS) processes using a liquid chromatography-organic carbon detector (LC-OCD) technique, and a combination of excitation-emission matrices (EEM) and parallel factor analysis (PARAFAC). The percentages of mineralization of NOM in the UV/H 2 O 2 and UV/PS processes were 20.5 and 83.3%, respectively, with a 10 mM oxidant dose and a contact time of 174 s (UV dose: approximately 30,000 mJ). Low-pressure, Hg UV lamp (254 nm) was applied in this experiment. The steady-state concentration of SO 4 - was 38-fold higher than that of OH at an oxidant dose of 10 mM. With para-chlorobenzoic acid (pCBA) as a radical probe compound, we experimentally determined the rate constants of Suwannee River NOM (SRNOM) with OH (k OH/NOM  = 3.3 × 10 8  M -1 s -1 ) and SO 4 - (k SO4-/NOM  = 4.55 × 10 6  M -1 s -1 ). The hydroxyl radical and sulfate radical showed different mineralization pathways of NOM, which have been verified by the use of LC-OCD and EEM/PARAFAC. Consequently, higher steady-state concentrations of SO 4 - , and different reaction preferences of OH and SO 4 - with the NOM constituent had an effect on the mineralization efficiency. Copyright © 2017 Elsevier Ltd. All rights reserved.

Evaluation on the Photosensitivity of 2,2′-Azobis(2,4-DimethylValeronitrile with UV

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Yi Yang

2017-12-01

Full Text Available Azo compounds have high exothermic characteristics and low thermal stability, which have caused many serious thermal accidents around the world. In general, different locations (e.g., equatorial or polar regions have different UV intensities. If the azo compound exists in an inappropriately stored or transported condition, the decrease in thermal stability may cause a thermal hazard or ageing. 2,2′-Azobis(2,4-dimethylvaleronitrile (ADVN is investigated with respect to the thermal stability affected by UV exposure at 0, 6, 12, and 24 h. When ADVN is exposed to 24 h of UV (100 mW/m2 and 254 nm, T0 is not only advanced, but the mass loss is also increased during the main decomposition stage. In addition, the apparent activation energy and integral procedural decomposition temperature (IPDT of ADVN exposed to 24 h of UV is calculated by kinetic models. Therefore, the prevention mechanism, thermal characteristics, and kinetic parameters are established in our study. We should isolate UV contacting ADVN under any situations, avoiding ADVN being aged or leading to thermal runaway. This study provided significant information for a safer process under changing UV exposure times for ADVN. Furthermore, the research method may serve as an important benchmark for handling potentially hazardous chemicals, such as azo compounds described herein.

Transformation of UV-hypersensitive Chinese hamster ovary cell mutants with UV-irradiated plasmids

International Nuclear Information System (INIS)

Nairn, R.S.; Humphrey, R.M.; Adair, G.M.

1988-01-01

Transfection of UV-hypersensitive, DNA repair-deficient Chinese hamster ovary (CHO) cell lines and parental, repair-proficient CHO cells with UV-irradiated pHaprt-1 or pSV2gpt plasmids resulted in different responses by recipient cell lines to UV damage in transfected DNA. Unlike results reported for human cells, UV irradiation of transfecting DNA did not stimulate genetic transformation of CHO recipient cells. In repair-deficient CHO cells, proportionally fewer transformants were produced with increasing UV damage than in repair-proficient cells in transfections with UV-irradiated hamster adenine phosphoribosyltransferase (APRT) gene contained in plasmid pHaprt-1. Transfection of CHO cells with UV-irradiated pSV2gpt resulted in neither decline in transformation frequencies in repair-deficient cell lines relative to repair-proficient cells nor stimulation of genetic transformation by UV damage in the plasmid. Blot hybridization analysis of DNA samples isolated from transformed cells showed no dramatic changes in copy number or arrangement of transfected plasmid DNA with increasing UV dose. The authors conclude responses of recipient cells to UV-damaged transfecting plasmids depend on type of recipient cell and characteristics of the genetic sequence used for transfection. (author)

Tailoring of TiO2 films by H2SO4 treatment and UV irradiation to improve anticoagulant ability and endothelial cell compatibility.

Science.gov (United States)

Liao, Yuzhen; Li, Linhua; Chen, Jiang; Yang, Ping; Zhao, Ansha; Sun, Hong; Huang, Nan

2017-07-01

Surfaces with dual functions that simultaneously exhibit good anticoagulant ability and endothelial cell (EC) compatibility are desirable for blood contact materials. However, these dual functions have rarely been achieved by inorganic materials. In this study, titanium dioxide (TiO 2 ) films were treated by sulphuric acid (H 2 SO 4 ) and ultraviolet (UV) irradiation successively (TiO 2 H 2 SO 4 -UV), resulting in good anticoagulant ability and EC compatibility simultaneously. We found that UV irradiation improved the anticoagulant ability of TiO 2 films significantly while enhancing EC compatibility, though not significantly. The enhanced anticoagulant ability could be related to the oxidation of surface-adsorbed hydrocarbons and increased hydrophilicity. The H 2 SO 4 treatment improved the anticoagulant ability of TiO 2 films slightly, while UV irradiation improved the anticoagulant ability strongly. The enhanced EC compatibility could be related to the increased surface roughness and positive charges on the surface of the TiO 2 films. Furthermore, the time-dependent degradation of the enhanced EC compatibility and anticoagulant ability of TiO 2 H 2 SO 4 -UV was observed. In summary, TiO 2 H 2 SO 4 -UV expressed both excellent anticoagulant ability and good EC compatibility at the same time, which could be desirable for blood contact materials. However, the compatibility of TiO 2 H 2 SO 4 -UV with smooth muscle cells (SMCs) and macrophages was also improved. More effort is still needed to selectively improve EC compatibility on TiO 2 films for better re-endothelialization. Copyright © 2017 Elsevier B.V. All rights reserved.

UV-Surface Treatment of Fungal Resistant Polyether Polyurethane Film-Induced Growth of Entomopathogenic Fungi.

Science.gov (United States)

Lando, Gabriela Albara; Marconatto, Letícia; Kessler, Felipe; Lopes, William; Schrank, Augusto; Vainstein, Marilene Henning; Weibel, Daniel Eduardo

2017-07-18

Synthetic polymers are the cause of some major environmental impacts due to their low degradation rates. Polyurethanes (PU) are widely used synthetic polymers, and their growing use in industry has produced an increase in plastic waste. A commercial polyether-based thermoplastic PU with hydrolytic stability and fungus resistance was only attacked by an entomopathogenic fungus, Metarhiziumanisopliae , when the films were pre-treated with Ultraviolet (UV) irradiation in the presence of reactive atmospheres. Water contact angle, Fourier transform infrared spectroscopy in attenuated total reflection mode (FTIR-ATR), scanning electron microscopy (SEM), and profilometer measurements were mainly used for analysis. Permanent hydrophilic PU films were produced by the UV-assisted treatments. Pristine polyether PU films incubated for 10, 30, and 60 days did not show any indication of fungal growth. On the contrary, when using oxygen in the UV pre-treatment a layer of fungi spores covered the sample, indicating a great adherence of the microorganisms to the polymer. However, if acrylic acid vapors were used during the UV pre-treatment, a visible attack by the entomopathogenic fungi was observed. SEM and FTIR-ATR data showed clear evidence of fungal development: growth and ramifications of hyphae on the polymer surface with the increase in UV pre-treatment time and fungus incubation time. The results indicated that the simple UV surface activation process has proven to be a promising alternative for polyether PU waste management.

UV-Surface Treatment of Fungal Resistant Polyether Polyurethane Film-Induced Growth of Entomopathogenic Fungi

Directory of Open Access Journals (Sweden)

Gabriela Albara Lando

2017-07-01

Full Text Available Synthetic polymers are the cause of some major environmental impacts due to their low degradation rates. Polyurethanes (PU are widely used synthetic polymers, and their growing use in industry has produced an increase in plastic waste. A commercial polyether-based thermoplastic PU with hydrolytic stability and fungus resistance was only attacked by an entomopathogenic fungus, Metarhiziumanisopliae, when the films were pre-treated with Ultraviolet (UV irradiation in the presence of reactive atmospheres. Water contact angle, Fourier transform infrared spectroscopy in attenuated total reflection mode (FTIR-ATR, scanning electron microscopy (SEM, and profilometer measurements were mainly used for analysis. Permanent hydrophilic PU films were produced by the UV-assisted treatments. Pristine polyether PU films incubated for 10, 30, and 60 days did not show any indication of fungal growth. On the contrary, when using oxygen in the UV pre-treatment a layer of fungi spores covered the sample, indicating a great adherence of the microorganisms to the polymer. However, if acrylic acid vapors were used during the UV pre-treatment, a visible attack by the entomopathogenic fungi was observed. SEM and FTIR-ATR data showed clear evidence of fungal development: growth and ramifications of hyphae on the polymer surface with the increase in UV pre-treatment time and fungus incubation time. The results indicated that the simple UV surface activation process has proven to be a promising alternative for polyether PU waste management.

Superhydrophilic poly (styrene co acrylonitrile)-ZnO nanocomposite surfaces for UV shielding and self-cleaning applications

Science.gov (United States)

Singh, Rajender; Sharma, Ramesh; Barman, P. B.; Sharma, Dheeraj

2017-11-01

UV shielding based super hydrophilic material is developed in the present formulation by in situ emulsion polymerization of poly (styrene-acrylonitrile) with ZnO nanoparticles. The ESI-MS technique confirms the structure of polymer nanocomposite by their mass fragments. The XRD study confirms the presence of ZnO phase in polymer matrix. PSAN/ZnO nanocomposite leads to give effective UV shielding (upto 375 nm) and visible luminescence with ZnO content in polymer matrix. The FESEM and TEM studies confirm the symmetrical, controlled growth of PNs. The incorporation of ZnO nanofillers into PSAN matrix lead to restructuring the PNs surfaces into superhydrophilic surfaces in water contact angle (WCA) from 70° to 10°. We believe our synthesized PSAN/ZnO nanocomposite could be potential as UV shielding, luminescent and super hydrophilic nature based materials in related commercial applications.

Comets in UV

Science.gov (United States)

Shustov, B.; Sachkov, M.; Gómez de Castro, A. I.; Vallejo, J. C.; Kanev, E.; Dorofeeva, V.

2018-04-01

Comets are important "eyewitnesses" of Solar System formation and evolution. Important tests to determine the chemical composition and to study the physical processes in cometary nuclei and coma need data in the UV range of the electromagnetic spectrum. Comprehensive and complete studies require additional ground-based observations and in situ experiments. We briefly review observations of comets in the ultraviolet (UV) and discuss the prospects of UV observations of comets and exocomets with space-borne instruments. A special reference is made to the World Space Observatory-Ultraviolet (WSO-UV) project.

Use of satellite erythemal UV products in analysing the global UV changes

Directory of Open Access Journals (Sweden)

I. Ialongo

2011-09-01

Full Text Available Long term changes in solar UV radiation affect global bio-geochemistry and climate. The satellite-based dataset of TOMS (Total Ozone Monitoring System and OMI (Ozone Monitoring Instrument of erythemal UV product was applied for the first time to estimate the long-term ultraviolet (UV changes at the global scale. The analysis of the uncertainty related to the different input information is presented. OMI and GOME-2 (Global Ozone Monitoring Experiment-2 products were compared in order to analyse the differences in the global UV distribution and their effect on the linear trend estimation.

The results showed that the differences in the inputs (mainly surface albedo and aerosol information used in the retrieval, affect significantly the UV change calculation, pointing out the importance of using a consistent dataset when calculating long term UV changes. The areas where these differences played a major role were identified using global maps of monthly UV changes. Despite the uncertainties, significant positive UV changes (ranging from 0 to about 5 %/decade were observed, with higher values in the Southern Hemisphere at mid-latitudes during spring-summer, where the largest ozone decrease was observed.

Contact mechanics: contact area and interfacial separation from small contact to full contact

International Nuclear Information System (INIS)

Yang, C; Persson, B N J

2008-01-01

We present a molecular dynamics study of the contact between a rigid solid with a randomly rough surface and an elastic block with a flat surface. The numerical calculations mainly focus on the contact area and the interfacial separation from small contact (low load) to full contact (high load). For a small load the contact area varies linearly with the load and the interfacial separation depends logarithmically on the load. For a high load the contact area approaches the nominal contact area (i.e. complete contact), and the interfacial separation approaches zero. The numerical results have been compared with analytical theory and experimental results. They are in good agreement with each other. The present findings may be very important for soft solids, e.g. rubber, or for very smooth surfaces, where complete contact can be reached at moderately high loads without plastic deformation of the solids

Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials.

Science.gov (United States)

Chen, Hao; Zhang, Qi; Chou, Stephen Y

2015-02-27

Sapphire nanopatterning is the key solution to GaN light emitting diode (LED) light extraction. One challenge is to etch deep nanostructures with a vertical sidewall in sapphire. Here, we report a study of the effects of two masking materials (SiO2 and Cr) and different etching recipes (the reaction gas ratio, the reaction pressure and the inductive power) in a chlorine-based (BCl3 and Cl2) inductively coupled plasma (ICP) etching of deep nanopillars in sapphire, and the etching process optimization. The masking materials were patterned by nanoimprinting. We have achieved high aspect ratio sapphire nanopillar arrays with a much steeper sidewall than the previous etching methods. We discover that the SiO2 mask has much slower erosion rate than the Cr mask under the same etching condition, leading to the deep cylinder-shaped nanopillars (122 nm diameter, 200 nm pitch, 170 nm high, flat top, and a vertical sidewall of 80° angle), rather than the pyramid-shaped shallow pillars (200 nm based diameter, 52 nm height, and 42° sidewall) resulted by using Cr mask. The processes developed are scalable to large volume LED manufacturing.

Ultraviolet photoelectron spectroscopy investigation of interface formation in an indium-tin oxide/fluorocarbon/organic semiconductor contact

International Nuclear Information System (INIS)

Tong, S.W.; Lau, K.M.; Sun, H.Y.; Fung, M.K.; Lee, C.S.; Lifshitz, Y.; Lee, S.T.

2006-01-01

It has been demonstrated that hole-injection in organic light-emitting devices (OLEDs) can be enhanced by inserting a UV-illuminated fluorocarbon (CF x ) layer between indium-tin oxide (ITO) and organic hole-transporting layer (HTL). In this work, the process of interface formation and electronic properties of the ITO/CF x /HTL interface were investigated with ultraviolet photoelectron spectroscopy. It was found that UV-illuminated fluorocarbon layer decreases the hole-injection barrier from ITO to α-napthylphenylbiphenyl diamine (NPB). Energy level diagrams deduced from the ultraviolet photoelectron spectroscopy (UPS) spectra show that the hole-injection barrier in ITO/UV-treated CF x /NPB is the smallest (0.46 eV), compared to that in the ITO/untreated CF x /NPB (0.60 eV) and the standard ITO/NPB interface (0.68 eV). The improved current density-voltage (I-V) characteristics in the UV-treated CF x -coated ITO contact are consistent with its smallest barrier height

Photopatch and UV-irradiated patch testing in photosensitive dermatitis

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Reena Rai

2016-01-01

Full Text Available Background: The photopatch test is used to detect photoallergic reactions to various antigens such as sunscreens and drugs. Photosensitive dermatitis can be caused due to antigens like parthenium, fragrances, rubbers and metals. The photopatch test does not contain these antigens. Therefore, the Indian Standard Series (ISS along with the Standard photopatch series from Chemotechnique Diagnostics, Sweden was used to detect light induced antigens. Aim: To detect light induced antigens in patients with photosensitive dermatitis. Methods: This study was done in a descriptive, observer blinded manner. Photopatch test and ISS were applied in duplicate on the patient's back by the standard method. After 24 hours, readings were recorded according to ICDRG criteria. One side was closed and other side irradiated with 14 J/cm2 of UVA and a second set of readings were recorded after 48 hrs. Result: The highest positivity was obtained with parthenium, with 18 out of 35 (51% patients showing a positive patch test reaction with both photoallergic contact dermatitis and photoaggravation. Four patients (11% showed positive patch test reaction suggestive of contact dermatitis to potassium dichromate and fragrance mix. Six patients had contact dermatitis to numerous antigens such as nickel, cobalt, chinoform and para-phenylenediamine. None of these patients showed photoaggravation on patch testing. Conclusion: Parthenium was found to cause photoallergy, contact dermatitis with photoaggravation and contact allergy. Hence, photopatch test and UV irradiated patch test can be an important tool to detect light induced antigens in patients with photosensitive dermatitis.

Dichotomy in response to indomethacin in uv-C and uv-B induced ultraviolet light inflammation

International Nuclear Information System (INIS)

Eaglstein, W.H.; Marsico, A.R.

1975-01-01

In subjects irradiated with both UV-C and UV-B ultraviolet light (UVL), 10 μg of intradermal indomethacin decreased the redness in all 13 of the UV-B irradiated areas but in only 2 of 13 of the UV-C irradiated areas. Higher doses of intradermal indomethacin (50 μg and 100 μg) decreased the redness produced by UV-C irradiation in 6 subjects. It is suggested that the failure of 10 μg of indomethacin to decrease the redness of the UV-C induced inflammation, while decreasing the redness in the UV-B induced inflammation, is consistent with the possibility that prostaglandins participate in UV-B but not UV-C induced inflammation

Two-components UV-therapy

International Nuclear Information System (INIS)

Pullmann, H.; Steigleder, G.K.

1980-01-01

20 patients with generalized psoriasis were treated with an apparatus containing UV-A- and UV-B-fluorescence tubes to be switched separately. The therapy was started with an UV-A-dose of 12 J/cm 2 daily. After the first week of treatment UV-B in increasing doses was applicated additionally. Clearance was achieved in 80 percent. (orig.) [de

Directed Self-assembly of Block Copolymer with Sub-15 nm Domain Spacing Using Nanoimprinted Photoresist Templates

Science.gov (United States)

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Coughlin, E. Bryan; Xiao, Shuaigang; Russell, Thomas

There has been increasing interest in preparing block copolymer thin films with ultra-small domain spacings for use as etching masks for ultra-high resolution nanolithography. One method to prepare block copolymer materials with small feature sizes is salt doping, increasing the Flory-Huggins interaction and allowing microphase separation to be maintained at lower molecular weights. Lamellae-forming P2VP- b-PS- b-P2VP block copolymer with various molecular weight was synthesized using RAFT polymerization with a dual functional chain transfer agent. Copper (II) Chloride or Gold (III) chloride was found to be selectively associated with P2VP block and increase the unfavorable interactions between PS and P2VP blocks, driving the disordered block copolymer into the ordered state. A 14 nm lamellar spacing of P2VP- b-PS- b-P2VP thin film was prepared using copper (II) Chloride doping after acetone vapor annealing on neutral brushes. Metallic nano-wire arrays were prepared after selective infiltration of platinum salt into the P2VP domain and oxygen plasma treatment. The directed self-assembly of salt doped P2VP- b-PS- b-P2VP triblock copolymer having long-rang lateral order on nanoimprinted photoresist templates with shallow trenches was also studied.

Steric control of redox events in organo-uranium chemistry: synthesis and characterisation of U(V) oxo and nitrido complexes

OpenAIRE

Tsoureas, Nikolaos; Kilpatrick, Alexander; Inman, Christopher; Cloke, Frederick Geoffrey

2016-01-01

The synthesis and molecular structures of a U(V) neutral terminal oxo complex and a U(V) sodium uranium nitride contact ion pair are described. The synthesis of the former is achieved by the use of tBuNCO as a mild oxygen transfer reagent, whilst that of the latter is via the reduction of NaN3. Both mono-uranium complexes are stabilised by the presence of bulky silyl substituents on the ligand framework that facilitate a 2e- oxidation of a single U(III) centre. In contrast, when steric hindra...

UV exposure in cars.

Science.gov (United States)

Moehrle, Matthias; Soballa, Martin; Korn, Manfred

2003-08-01

There is increasing knowledge about the hazards of solar and ultraviolet (UV) radiation to humans. Although people spend a significant time in cars, data on UV exposure during traveling are lacking. The aim of this study was to obtain basic information on personal UV exposure in cars. UV transmission of car glass samples, windscreen, side and back windows and sunroof, was determined. UV exposure of passengers was evaluated in seven German middle-class cars, fitted with three different types of car windows. UV doses were measured with open or closed windows/sunroof of Mercedes-Benz E 220 T, E 320, and S 500, and in an open convertible car (Mercedes-Benz CLK). Bacillus subtilis spore film dosimeters (Viospor) were attached to the front, vertex, cheeks, upper arms, forearms and thighs of 'adult' and 'child' dummies. UV wavelengths longer than >335 nm were transmitted through car windows, and UV irradiation >380 nm was transmitted through compound glass windscreens. There was some variation in the spectral transmission of side windows according to the type of glass. On the arms, UV exposure was 3-4% of ambient radiation when the car windows were shut, and 25-31% of ambient radiation when the windows were open. In the open convertible car, the relative personal doses reached 62% of ambient radiation. The car glass types examined offer substantial protection against short-wave UV radiation. Professional drivers should keep car windows closed on sunny days to reduce occupational UV exposure. In individuals with polymorphic light eruption, produced by long-wave UVA, additional protection by plastic films, clothes or sunscreens appears necessary.

uv dye lasers

International Nuclear Information System (INIS)

Abakumov, G.A.; Fadeev, V.V.; Khokhlov, R.V.; Simonov, A.P.

1975-01-01

The most important property of visible dye lasers, that is, continuous wavelength tuning, stimulated the search for dyes capable to lase in uv. They were found in 1968. Now the need for tunable uv lasers for applications in spectroscopy, photochemistry, isotope separation, remote air and sea probing, etc. is clearly seen. A review of some recent advances in uv dye lasers is reviewed

Inactivation of antibiotic resistance genes in municipal wastewater effluent by chlorination and sequential UV/chlorination disinfection

Energy Technology Data Exchange (ETDEWEB)

Zhang, Yingying; Zhuang, Yao; Geng, Jinju, E-mail: jjgeng@nju.edu.cn; Ren, Hongqiang, E-mail: hqren@nju.edu.cn; Zhang, Yan; Ding, Lili; Xu, Ke

2015-04-15

This study investigated disinfection methods including chlorination, ultraviolet (UV) irradiation and sequential UV/chlorination treatment on the inactivation of antibiotic resistance genes (ARGs). ARGs including sul1, tetX, tetG, intI1, and 16S rRNA genes in municipal wastewater treatment plant (MWTP) effluent were examined. The results indicated a positive correlation between the removal of ARGs and chlorine dosage (p = 0.007–0.014, n = 6),as well as contact time (p = 0.0001, n = 10). Greater free chlorine (FC) dosage leads to higher removal for all the genes and the maximum removal (1.30–1.49 logs) could be achieved at FC dosage of 30 mg L{sup −1}. The transformation kinetic data for ARGs removal (log C{sub 0} / C) followed the second-order reaction kinetic model with FC dosage (R{sup 2} = 0.6829–0.9999) and contact time (R{sup 2} = 0.7353–8634), respectively. Higher ammonia nitrogen (NH{sub 3}–N) concentration was found to lead to lower removal of ARGs at the same chlorine dosage. When the applied Cl{sub 2}:NH{sub 3}–N ratio was over 7.6:1, a significant reduction of ARGs (1.20–1.49 logs) was achieved. By using single UV irradiation, the log removal values of tetX and 16Ss rRNA genes were 0.58 and 0.60, respectively, while other genes were 0.36–0.40 at a fluence of 249.5 mJ cm{sup −2}, which was observed to be less effective than chlorination. With sequential UV/chlorination treatment, 0.006 to 0.31 log synergy values of target genes were observed under different operation parameters. - Highlights: • Chlorine is more effective than UV irradiation in removing ARGs from MWTP effluent. • The chlorination reaction followed the second-order reaction kinetic model. • Higher NH{sub 3}–N contents result in lower ARGs removal in the chlorination process. • FC is more effective than CC on the inactivation of ARGs. • UV irradiation followed by chlorination shows high efficiency in removing ARGs.

Modeling the natural UV irradiation and comparative UV measurements at Moussala BEO (BG)

Science.gov (United States)

Tyutyundzhiev, N.; Angelov, Ch; Lovchinov, K.; Nitchev, Hr; Petrov, M.; Arsov, T.

2018-03-01

Studies of and modeling the impact of natural UV irradiation on the human population are of significant importance for human activity and economics. The sharp increase of environmental problems – extraordinary temperature changes, solar irradiation abnormalities, icy rains – raises the question of developing novel means of assessing and predicting potential UV effects. In this paper, we discuss new UV irradiation modeling based on recent real-time measurements at Moussala Basic Environmental Observatory (BEO) on Moussala Peak (2925 m ASL) in Rila Mountain, Bulgaria, and highlight the development and initial validation of portable embedded devices for UV-A, UV-B monitoring using open-source software architecture, narrow bandpass UV sensors, and the popular Arduino controllers. Despite the high temporal resolution of the VIS and UV irradiation measurements, the results obtained reveal the need of new assumptions in order to minimize the discrepancy with available databases.

Transcriptional and cellular effects of benzotriazole UV stabilizers UV-234 and UV-328 in the freshwater invertebrates Chlamydomonas reinhardtii and Daphnia magna.

Science.gov (United States)

Giraudo, Maeva; Cottin, Guillaume; Esperanza, Marta; Gagnon, Pierre; Silva, Amila O De; Houde, Magali

2017-12-01

Benzotriazole ultra violet stabilizers (BZT-UVs) are compounds used in many applications and products to prevent photochemical degradation. Despite their widespread presence in aquatic ecosystems and persistence in the environment, there are very limited data on their effects and toxicity, and their modes of action remain largely unknown. The objectives of the present study were to evaluate the chronic effects of 2 BZT-UVs, 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol (UV-234) and 2-(2H-benzotriazol-2-yl)-4,6-di-tert-pentylphenol (UV-328), on the freshwater green algae Chlamydomonas reinhardtii and the freshwater crustacean Daphnia magna. Organisms were exposed to 0.01 and 10 μg/L of UV-234, UV-328, as well as a mixture of the 2 compounds. Life-history endpoints (viability, reproduction, and growth) and oxidative stress-related biomarkers (gene transcription, reactive oxygen species [ROS] production, and lipid peroxidation) were measured. Daphnia magna growth, reproduction, and gene transcription were not impacted by 21-d individual or mixed exposure. After 96-h of exposure, no differences were observed on the cellular viability of C. reinhardtii for either of the 2 BZT-UVs. In the algae, results showed increased ROS production in response to UV-328 and lipid peroxidation following exposure to UV-234. Synergistic effects of the 2 BZT-UVs were evident at the transcriptional level with 2 to 6 times up-regulation of glutathione peroxidase (gp x ) in response to the mixture for all treatment conditions. The transcription of superoxide dismutase (sod), catalase (cat), and ascorbic peroxidase (apx) was also regulated by UV-234 and UV-328 in the green algae, most likely as a result of ROS production and lipid peroxidation. Results from the present study suggest potential impacts of UV-234 and UV-328 exposure on the antioxidant defense system in C. reinhardtii. Environ Toxicol Chem 2017;36:3333-3342. © 2017 Crown in the Right of Canada. Published by

/UV Synergistic Aging of Polyester Polyurethane Film Modified by Composite UV Absorber

Directory of Open Access Journals (Sweden)

Yanzhi Wang

2013-01-01

Full Text Available The pure polyester polyurethane (TPU film and the modified TPU (M-TPU film containing 2.0 wt.% inorganic UV absorbers mixture (nano-ZnO/CeO2 with weight ratio of 3 : 2 and 0.5 wt.% organic UV absorbers mixture (UV-531/UV-327 with weight ratio of 1 : 1 were prepared by spin-coating technique. The accelerated aging tests of the films exposed to constant UV radiation of 400 ± 20 µW/cm2 (313 nm with an ozone atmosphere of 100 ± 2 ppm were carried out by using a self-designed aging equipment at ambient temperature and relative humidity of 20%. The aging resistance properties of the films were evaluated by UV-Vis spectra, Fourier transform infrared spectra (FT-IR, photooxidation index, and carbonyl index analysis. The results show that the composite UV absorber has better protection for TPU system, which reduces distinctly the degradation of TPU film. O3/UV aging of the films increases with incremental exposure time. PI and CI of TPU and M-TPU films increase with increasing exposure time, respectively. PI and CI of M-TPU films are much lower than that of TPU film after the same time of exposure, respectively. Distinct synergistic aging effect exists between ozone aging and UV aging when PI and CI are used as evaluation index, respectively. Of course, the formula of these additives needs further improvement for industrial application.

RIMS (real-time imprint monitoring by scattering of light) study of pressure, temperature and resist effects on nanoimprint lithography

International Nuclear Information System (INIS)

Yu Zhaoning; Gao He; Chou, Stephen Y

2007-01-01

To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Recently we have developed a real-time imprint monitoring by the scattering-of-light (RIMS) approach, which allows us to detect the degree of resist deformation and the duration of resist penetration by a mould during the imprint process in real time. In this paper we report the performances of RIMS under a broad range of working conditions. RIMS data shows that the resist penetration is facilitated by increasing processing temperature, pressure and the resist film thickness; a prolonged pre-NIL resist baking step, on the other hand, has the effect of slowing it down. Our results provide further demonstration of the effectiveness of this method under different working conditions. RIMS measurements show not only how long an imprint takes to complete, but also how an imprint progresses with time and how it is affected by differences in processing parameters. These measurements provide information crucial for a better understanding and process optimization in NIL

In Vitro Model for Predicting the Protective Effect of Ultraviolet-Blocking Contact Lens in Human Corneal Epithelial Cells.

Science.gov (United States)

Abengózar-Vela, Antonio; Arroyo, Cristina; Reinoso, Roberto; Enríquez-de-Salamanca, Amalia; Corell, Alfredo; González-García, María Jesús

2015-01-01

To develop an in vitro method to determine the protective effect of UV-blocking contact lenses (CLs) in human corneal epithelial (HCE) cells exposed to UV-B radiation. SV-40-transformed HCE cells were covered with non-UV-blocking CL, UV-blocking CL or not covered, and exposed to UV-B radiation. As control, HCE cells were covered with both types of CLs or not covered, but not exposed to UV-B radiation. Cell viability at 24, 48 and 72 h, after UV-B exposure and removing CLs, was determined by alamarBlue(®) assay. Percentage of live, dead and apoptotic cells was also assessed by flow cytometry after 24 h of UV-B exposure. Intracellular reactive oxygen species (ROS) production after 1 h of exposure was assessed using the dye H(2)DCF-DA. Cell viability significantly decreased, apoptotic cells and intracellular ROS production significantly increased when UVB-exposed cells were covered with non-UV-blocking CL or not covered compared to non-irradiated cells. When cells were covered with UV-blocking CL, cell viability significantly increased and apoptotic cells and intracellular ROS production did not increase compared to exposed cells. UV-B radiation induces cell death by apoptosis, increases ROS production and decreases viable cells. UV-blocking CL is able to avoid these effects increasing cell viability and protecting HCE cells from apoptosis and ROS production induced by UV-B radiation. This in vitro model is an alternative to in vivo methods to determine the protective effect of UV-blocking ophthalmic biomaterials because it is a quicker, cheaper and reliable model that avoids the use of animals.

The effect of UV irradiation on the early development of silkworm embryos, (2)

International Nuclear Information System (INIS)

Kobayashi, Yoshihiro

1981-01-01

The development of silkworm eggs irradiated with UV was compared with that of normal eggs. When the eggs were irradiated with UV from the lateral side immediately after oviposition, development was decelerated, but the germ band was produced. The side of the germ band that was irradiated with UV was abnormal with holes, but the opposite side was hole-free and normal. The normal half of the germ band splits longitudinally, but developed along with the abnormal half to form various malformations. When the eggs were irradiated from the ventral side, the ventral part of the germ band was abnormal at the early stage, the germ band did not concentrate to one place, and produced the half-embryos longitudinally divided by the median line. The UV irradiation at the beginning of the blastoderm stage produced similar results. In the areas irradiated by UV, cleavage nuclei invaded into the surrounding protoplasm, and mitotic figures were observed, but the cell number did not increase even with the advance of development unlike normal cells, whereas the sizes of the cells, their nuclei and nucleoli were enlarged, and intercellular space widened so that the cells were no longer in close contact. The germ band cells produced in the non-irradiated area were normal. The above results suggest that when either the protoplasm or the nucleus of a silkworm egg is damaged by UV, the effect first appears as the inhibition of cell division in the germ band, and as the enlargement of the cell, nucleus and nucleoli. It is presumed that this induces the subsequent inhibition of cell differentiation or abnormalities. (Kaihara, S.)

Inactivation of avirulent Yersinia pestis on food and food contact surfaces by ultraviolet light and freezing.

Science.gov (United States)

Sommers, Christopher H; Sheen, Shiowshuh

2015-09-01

Yersinia pestis, the causative agent of plague, can occasionally be contracted as a naso-pharyngeal or gastrointestinal illness through consumption of contaminated meat. In this study, the use of 254 nm ultraviolet light (UV-C) to inactivate a multi-isolate cocktail of avirulent Y. pestis on food and food contact surfaces was investigated. When a commercial UV-C conveyor was used (5 mW/cm(2)/s) 0.5 J/cm(2) inactivated >7 log of the Y. pestis cocktail on agar plates. At 0.5 J/cm(2), UV-C inactivated ca. 4 log of Y. pestis in beef, chicken, and catfish, exudates inoculated onto high density polypropylene or polyethylene, and stainless steel coupons, and >6 log was eliminated at 1 J/cm(2). Approximately 1 log was inactivated on chicken breast, beef steak, and catfish fillet surfaces at a UV-C dose of 1 J/cm(2). UV-C treatment prior to freezing of the foods did not increase the inactivation of Y. pestis over freezing alone. These results indicate that routine use of UV-C during food processing would provide workers and consumers some protection against Y. pestis. Published by Elsevier Ltd.

Temporal variation of optimal UV exposure time over Korea: risks and benefits of surface UV radiation

Science.gov (United States)

Lee, Y. G.; Koo, J. H.

2015-12-01

Solar UV radiation in a wavelength range between 280 to 400 nm has both positive and negative influences on human body. Surface UV radiation is the main natural source of vitamin D, providing the promotion of bone and musculoskeletal health and reducing the risk of a number of cancers and other medical conditions. However, overexposure to surface UV radiation is significantly related with the majority of skin cancer, in addition other negative health effects such as sunburn, skin aging, and some forms of eye cataracts. Therefore, it is important to estimate the optimal UV exposure time, representing a balance between reducing negative health effects and maximizing sufficient vitamin D production. Previous studies calculated erythemal UV and vitamin-D UV from the measured and modelled spectral irradiances, respectively, by weighting CIE Erythema and Vitamin D3 generation functions (Kazantzidis et al., 2009; Fioletov et al., 2010). In particular, McKenzie et al. (2009) suggested the algorithm to estimate vitamin-D production UV from erythemal UV (or UV index) and determined the optimum conditions of UV exposure based on skin type Ⅱ according to the Fitzpatrick (1988). Recently, there are various demands for risks and benefits of surface UV radiation on public health over Korea, thus it is necessary to estimate optimal UV exposure time suitable to skin type of East Asians. This study examined the relationship between erythemally weighted UV (UVEry) and vitamin D weighted UV (UVVitD) over Korea during 2004-2012. The temporal variations of the ratio (UVVitD/UVEry) were also analyzed and the ratio as a function of UV index was applied in estimating the optimal UV exposure time. In summer with high surface UV radiation, short exposure time leaded to sufficient vitamin D and erythema and vice versa in winter. Thus, the balancing time in winter was enough to maximize UV benefits and minimize UV risks.

Impact of Room Location on UV-C Irradiance and UV-C Dosage and Antimicrobial Effect Delivered by a Mobile UV-C Light Device.

Science.gov (United States)

Boyce, John M; Farrel, Patricia A; Towle, Dana; Fekieta, Renee; Aniskiewicz, Michael

2016-06-01

OBJECTIVE To evaluate ultraviolet C (UV-C) irradiance, UV-C dosage, and antimicrobial effect achieved by a mobile continuous UV-C device. DESIGN Prospective observational study. METHODS We used 6 UV light sensors to determine UV-C irradiance (W/cm2) and UV-C dosage (µWsec/cm2) at various distances from and orientations relative to the UV-C device during 5-minute and 15-minute cycles in an ICU room and a surgical ward room. In both rooms, stainless-steel disks inoculated with methicillin-resistant Staphylococcus aureus (MRSA), vancomycin-resistant Enterococcus (VRE), and Clostridium difficile spores were placed next to sensors, and UV-C dosages and log10 reductions of target organisms achieved during 5-minute and 15-minute cycles were determined. Mean irradiance and dosage readings were compared using ANOVA. RESULTS Mean UV-C irradiance was nearly 1.0E-03 W/cm2 in direct sight at a distance of 1.3 m (4 ft) from the device but was 1.12E-05 W/cm2 on a horizontal surface in a shaded area 3.3 m (10 ft) from the device (P4 to 1-3 for MRSA, >4 to 1-2 for VRE and >4 to 0 log10 for C. difficile spores, depending on the distance from, and orientation relative to, the device with 5-minute and 15-minute cycles. CONCLUSION UV-C irradiance, dosage, and antimicrobial effect received from a mobile UV-C device varied substantially based on location in a room relative to the UV-C device. Infect Control Hosp Epidemiol 2016;37:667-672.

Tekstilde Uv Absorban Madde Uygulamaları The Applications of UV Absorber on Textiles

OpenAIRE

MERDAN, Nigar; ACAR, Kamil

2009-01-01

Tekstiller UV radyasyonuna karşı koruma sağlarken, bu aşamada radyasyonun dozu da önem taşımaktadır. Bu nedenle tekstil materyallerine UV absorban maddeler, liflerin üretimi esnasında ya da bitim işlemlerinde uygulanmaktadır. UV absorban maddelerin kullanılmasıyla, tekstil ürünlerinde UV ışınlarının geçirgenliğinin yoğunluk derecesi azaltılır. UV absorbanları, materyale gelen ışık tarafından oluşan olumsuz etkileri engeller

UV Radiation and the Skin

Directory of Open Access Journals (Sweden)

Timothy Scott

2013-06-01

Full Text Available UV radiation (UV is classified as a “complete carcinogen” because it is both a mutagen and a non-specific damaging agent and has properties of both a tumor initiator and a tumor promoter. In environmental abundance, UV is the most important modifiable risk factor for skin cancer and many other environmentally-influenced skin disorders. However, UV also benefits human health by mediating natural synthesis of vitamin D and endorphins in the skin, therefore UV has complex and mixed effects on human health. Nonetheless, excessive exposure to UV carries profound health risks, including atrophy, pigmentary changes, wrinkling and malignancy. UV is epidemiologically and molecularly linked to the three most common types of skin cancer, basal cell carcinoma, squamous cell carcinoma and malignant melanoma, which together affect more than a million Americans annually. Genetic factors also influence risk of UV-mediated skin disease. Polymorphisms of the melanocortin 1 receptor (MC1R gene, in particular, correlate with fairness of skin, UV sensitivity, and enhanced cancer risk. We are interested in developing UV-protective approaches based on a detailed understanding of molecular events that occur after UV exposure, focusing particularly on epidermal melanization and the role of the MC1R in genome maintenance.

Poling of UV-written Waveguides

DEFF Research Database (Denmark)

Arentoft, Jesper; Kristensen, Martin; Hübner, Jörg

1999-01-01

We report poling of UV-written silica waveguides. Thermal poling induces an electro-optic coefficient of 0.05 pm/V. We also demonstrate simultaneous UV-writing and UV-poling. No measurable decay in the induced electro-optic effect was detected after nine months......We report poling of UV-written silica waveguides. Thermal poling induces an electro-optic coefficient of 0.05 pm/V. We also demonstrate simultaneous UV-writing and UV-poling. No measurable decay in the induced electro-optic effect was detected after nine months...

Standardization of UV LED measurements

Science.gov (United States)

Eppeldauer, G. P.; Larason, T. C.; Yoon, H. W.

2015-09-01

Traditionally used source spectral-distribution or detector spectral-response based standards cannot be applied for accurate UV LED measurements. Since the CIE standardized rectangular-shape spectral response function for UV measurements cannot be realized with small spectral mismatch when using filtered detectors, the UV measurement errors can be several times ten percent or larger. The UV LEDs produce broadband radiation and both their peaks or spectral bandwidths can change significantly. The detectors used for the measurement of these LEDs also have different spectral bandwidths. In the discussed example, where LEDs with 365 nm peak are applied for fluorescent crack-recognition using liquid penetrant (non-destructive) inspection, the broadband radiometric LED (signal) measurement procedure is standardized. A UV LED irradiance-source was calibrated against an FEL lamp standard to determine its spectral irradiance. The spectral irradiance responsivity of a reference UV meter was also calibrated. The output signal of the reference UV meter was calculated from the spectral irradiance of the UV source and the spectral irradiance responsivity of the reference UV meter. From the output signal, both the integrated irradiance (in the reference plane of the reference meter) and the integrated responsivity of the reference meter were determined. Test UV meters calibrated for integrated responsivity against the reference UV meter, can be used to determine the integrated irradiance from a field UV source. The obtained 5 % (k=2) measurement uncertainty can be decreased when meters with spectral response close to a constant value are selected.

Improved Pt/Au and W/Pt/Au Schottky contacts on n-type ZnO using ozone cleaning

International Nuclear Information System (INIS)

Ip, K.; Gila, B.P.; Onstine, A.H.; Lambers, E.S.; Heo, Y.W.; Baik, K.H.; Norton, D.P.; Pearton, S.J.; Kim, S.; LaRoche, J.R; Ren, F.

2004-01-01

UV-ozone cleaning prior to metal deposition of either e-beam Pt contacts or sputtered W contacts on n-type single-crystal ZnO is found to significantly improve their rectifying characteristics. Pt contacts deposited directly on the as-received ZnO surface are Ohmic but show rectifying behavior with ozone cleaning. The Schottky barrier height of these Pt contacts was 0.70 eV, with ideality factor of 1.5 and a saturation current density of 6.2x10 -6 A cm -2 . In contrast, the as-deposited W contacts are Ohmic, independent of the use of ozone cleaning. Postdeposition annealing at 700 deg. C produces rectifying behavior with Schottky barrier heights of 0.45 eV for control samples and 0.49 eV for those cleaned with ozone exposure. The improvement in rectifying properties of both the Pt and W contacts is related to removal of surface carbon contamination from the ZnO

UV-indeks og dets betydning

DEFF Research Database (Denmark)

Wulf, Hans Christian; Eriksen, Paul

2010-01-01

The published UV index refers to the expected UV intensity at mid day, when the solar elevation is at its maximum. In Scandinavia, the maximum UV index is seven around midsummer. When the UV index is three, the erythema-weighted dose will be three Standard Erythema Dose (SED) in the hour with max...... a sunburn already when the UV index is higher than two....

Flexible TiO{sub 2}/paper platforms for UV/ozone sensing

Energy Technology Data Exchange (ETDEWEB)

Nunes, Daniela; Pimentel, Ana; Calmeiro, Tomas; Araujo, Andréia; Nandy, Suman; Pinto, Joana V.; Barquinha, Pedro; Fortunato, Elvira Maria Correia; Martins, Rodrigo Ferrão de Paiva, E-mail: daniela.gomes@fct.unl.pt [i3N/CENIMAT - Department of Materials Science, Faculty of Sciences and Technology, Universidade NOVA de Lisboa, Caparica (Portugal)

2016-07-01

Full text: Titanium dioxide (TiO{sub 2}) has been extensively studied for applications ranging from dye-solar cells, photo catalysis to sensors [1]. In the present study, TiO{sub 2} nanorod arrays were grown on tracing paper (90 g/cm{sup 2}) under microwave irradiation and without any seed layer. This simple and low temperature synthesis (80 deg C) route formed nanostructures on both sides of the paper, totally covering the flexible substrate. Closely packed nanorod arrays were formed appearing as aggregates with a cauliflower aspect. This nanorod aggregated structure increases the sensitivity due to the large surface area-to-volume ratio, which associated to high quality crystal structure, makes this material as a suitable UV/ozone sensor candidate with high on/off ratios between photo current and dark current. In order to measure the device photocurrent, conductive AFM measurements were carried out, using a 254 nm UV lamp. The dark current displayed 3 times less response than under UV exposure (bias voltage of 5 V). The current-voltage (IV) curves under the UV exposure or dark conditions were also assessed with the deposition of Al contacts and using a probe station. Moreover, the time resolved photocurrent of the devices in response to the UV turn on/off was investigated. Structural characterization of the devices was carried out by scanning electron microscopy (SEM) coupled with X-ray energy dispersive spectroscopy (EDS), Xray diffraction (XRD), together with the investigation of their optical properties. Thus, in association to the recyclability, biocompatible and highly inexpensive characteristics of the substrate used, the approach developed in this study can be a competitive alternative for the UV/ozone sensors employed nowadays. [1] D. Nunes, A. Pimentel, J.V. Pinto, T.R. Calmeiro, S. Nandy, P. Barquinha, L. Pereira, P.A. Carvalho, E. Fortunato, R. Martins, Photocatalytic behavior of TiO{sub '}2 films synthesized by microwave irradiation, Catalysis

Workers' dermal exposure to UV-curable acrylates in the furniture and Parquet industry.

Science.gov (United States)

Surakka, J; Lindh, T; Rosén, G; Fischer, T

2000-12-01

The use of ultraviolet radiation-curable coatings (UV-coatings) has increased rapidly in the parquet and furniture industry. Work with UV-coatings involves risk from skin exposure to chemically reactive, concentrated acrylates that are known skin contact irritants and sensitizers. Yet, the methods and tools for measuring and quantifying dermal exposure from hazardous chemicals directly on the skin are limited and methods to measure skin exposure to UV-coatings in occupational or environmental settings have been lacking. Skin exposure to UV-coatings was measured employing a quantitative tape stripping method that we have developed for this purpose. A pilot study was performed at three workplaces. In the main study, workers' skin exposure to uncured UV-coatings was measured at seven workplaces and on two separate workdays (rounds 1 and 2) within a six-month period to determine exposure variation. Skin exposure was measured at four standardized sites on the hand, 3-4 times per work shift. The forehead was sampled once. A questionnaire was carried out with the workers in both rounds to find out factors that can affect skin exposure to UV-coatings. The pilot study indicated that both skin and surface contamination to TPGDA-containing UV-coatings were common and varied up to 2110 microgram on the sampling area of 10cm(2). In the main study skin contamination due to TPGDA was found on 16 of 23 workers, at 6 out of the 7 workplaces, and from 36 (5. 4%) of the 664 samples. In round one 8.6% (n=383) of the samples contained TPGDA and in round two 1.1 % (n=281). The average TPGDA mass on all the positive samples (n=36) was 30.4+/-77.0 microgram for the first and second rounds alone this mass was 30.6+/-80 (n=33) and 28.3+/-16.5 microgram (n=3), respectively. Despite the limited sampling area and sampling sites, we could find residues of TPGDA at all sampling times, even at the beginning of the work shift. This may be due to transfer of UV-coatings through contaminated

Protective effects of polyamines against UV-A and UV-B illumination in Physcia semipinnata thalli

Directory of Open Access Journals (Sweden)

Esmer Işıl

2017-04-01

Full Text Available The damage to DNA induced by UV-A and UV-B and protective effects of the polyamines putrescine (put, spermidine (spd and spermine (spm were investigated on the lichen Physcia semipinnata in the present study. Our results suggest that significant alterations of the photosynthetic quantum yield ratio occurred in response to increased UV-A and UV-B exposure time. The photosynthetic quantum yield ratio gradually decreased in P. semipinnata following exposure to UV-A and UV-B. Physcia semipinnata thalli which were treated with a polyamine in a concentration of 1 mM were not affected by UV-A exposure for 72 h. In the case of UV-B treatment, the protective polyamine dosage was 0.25 mM. We also used the random amplified polymorphic DNA (RAPD technique to detect DNA damage. The main changes observed in the RAPD profiles, which were obtained using 12 RAPD primers, were the appearance or disappearance of different bands and variation of their intensities. The use of at least three different primers allowed detection of specific band patterns in both UV-A- and UV-B-exposed samples treated with polyamines as compared to untreated ones.

Contact printed masks for 3D microfabrication in negative resists

DEFF Research Database (Denmark)

Häfliger, Daniel; Boisen, Anja

2005-01-01

We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

Effects of UV irradiation and UV/chlorine co-exposure on natural organic matter in water

International Nuclear Information System (INIS)

Liu, Wei; Zhang, Zaili; Yang, Xin; Xu, Yiyue; Liang, Yongmei

2012-01-01

The effects of co-exposure to ultraviolet (UV) irradiation (with either low- or medium-pressure UV lamps) and free chlorine (chloramine) at practical relevant conditions on changes in natural organic matter (NOM) properties were investigated using four waters. The changes were characterized using the specific disinfection by-product formation potential (SDBPFP), specific total organic halogen formation potential (STOXFP), differential UV absorbance (∆UVA), and size-exclusion chromatography (SEC). The results for exposure to UV irradiation alone and for samples with no exposure were also obtained. The SDBPFPs in all UV-irradiated NOM waters observed were higher than those of non-irradiated samples. UV irradiation led to increases in STOXFPs as a result of chlorination, but no changes, or only small decreases, from chloramination. UV irradiation alone led to positive ∆UVA spectra of the four NOM waters; co-exposure to UV and chlorine gave larger negative ∆UVA spectra than those obtained by chlorine exposure alone. No obvious changes in SEC results were observed for samples only irradiated with UV light; co-exposure gave no detectable changes in the abundances of small fractions for exposure to chlorine only. Both UV photooxidation and photocatalytic oxidation appear to affect the reactivity of the NOM toward subsequent chlorination, and the magnitude of the changes is generally greater for medium-pressure lamps than for low-pressure lamps. These results suggest that applying UV disinfection technology to a particular source may not always be disinfection by-product-problem-free, and the interactions between UV light, chlorine, and NOM may need to be considered. - Highlights: ► We discussed the effects of co-exposure to UV light and chlorine on properties of natural organic matters in waters. ► UV irradiation led to increases in SDBPFP and STOXFP of NOM waters from chlorination. ► We suggest that applying an UV disinfection technology to a particular

Effect of UV irradiation on the apoptosis and necrosis of Jurkat cells using UV LEDs

Science.gov (United States)

Inada, Shunko A.; Amano, Hiroshi; Akasaki, Isamu; Morita, Akimichi; Kobayashi, Keiko

2009-02-01

Phototherapy is a very effective method for treating most of the incurable skin diseases. A fluorescent light bulb is used as a conventional UV light source for this type of therapy. However, infrared radiation from the light source sometimes causes serious problems on patient's health. In addition, the normal part of the skin is irradiated when a large fluorescent light bulb is used. Moreover, a conventional UV irradiation system is heavy and has a short lifetime and a high electrical power consumption. Therefore, a new UV light source for solving the problems of phototherapy is required. To realize low-power-consumption, lightweight and long-lifetime systems, group III nitride-based UV-A1 light-emitting diodes (LEDs) were investigated. We examined the UV LED irradiation of Jurkat cell, which is a tumor cell and more sensitive to UV light than a healthy cell. The numbers of apoptotic and necrotic cells were confirmed to be the same using a UV LED and a conventional lamp system. The UV LED showed the possibility of realizing a new UV light source for phototherapy.

Reactivation of UV- and γ-irradiated herpes virus in UV- and X-irradiated CV-1 cells

International Nuclear Information System (INIS)

Takimoto, K.; Niwa, O.; Sugahara, T.

1982-01-01

Enhanced reactivation of UV- and γ-irradiated herpes virus was investigated by the plaque assay on CV-1 monkey kidney monolayer cells irradiated with UV light or X-rays. Both UV- and X-irradiated CV-1 cells showed enhancement of survival of UV-irradiated virus, while little or no enhancement was detected for γ-irradiated virus assayed on UV- or X-irradiated cells. The enhanced reactivation of UV-irradiated virus was greater when virus infection was delayed 24 or 48 h, than for infection immediately following the irradiation of cells. Thus the UV- or X-irradiated CV-1 cells are able to enhance the repair of UV damaged herpes virus DNA, but not of γ-ray damaged ones. (author)

Development Of Hyper branched UV Curable Resin From Palm Oil

International Nuclear Information System (INIS)

Mek Zah Salleh; Mohamad Lokman Latif; Rida Tajau; Nik Ghazali Nik Salleh; Mohd Sofian Alias

2014-01-01

The hyper branched polyurethane acrylate (HBPUA) was prepared by reacting hyper branched polyol polyester (HBP) from palm oil based with diisocyanate and hydroxyl-containing acrylate monomer with the presence of 0.1-2 wt % dibutyltin dilaurate as a catalyst. The reaction was confirmed by several analyses for example determination of hydroxyl value (OHV), acid value (AV), Fourier transform infrared (FTIR) spectroscopy, gel permeation chromatography (GPC) and nuclear magnetic resonance (NMR) spectroscopy analyses. HBPUA required 0.36 J/ cm 2 energy when undergone curing with UV radiation. HBPUA / TMPTA films showed 4B-2H of pencil hardness, gel content of 60-80 %, contact angle θ between 65-74 degree and T g at -15 to -5 degree Celsius. The presence of TMPTA increased degree of cross-linking and pencil hardness. The characteristic of the polymeric material and the thermal stability of UV cured films of HBPUA formulations were determined by differential scanning calorimetry (DSC) and thermogravimetric analyzer (TGA). The thermal decomposition temperature started at 200 degree Celsius with T max at 450 to 455 degree Celsius. (author)

Comparative investigation of X-ray contrast medium degradation by UV/chlorine and UV/H2O2.

Science.gov (United States)

Kong, Xiujuan; Jiang, Jin; Ma, Jun; Yang, Yi; Pang, Suyan

2018-02-01

The degradation of iopamidol and diatrizoate sodium (DTZ) by UV/chlorine was carried out according to efficiency, mechanism, and oxidation products, and compared to that by UV/H 2 O 2 . The pseudo-first order rate (k') of iopamidol and DTZ was accelerated by UV/chlorine compared to that by UV and chlorine alone. k' of iopamidol and DTZ by UV/chlorine increased with increasing chlorine dosage. Both of iopamidol and DTZ could not be effectively removed by UV/H 2 O 2 compared to that by UV/chlorine. Secondary radicals (Cl 2 - and ClO) rather than primary radicals (HO and Cl) were demonstrated to be mainly responsible for the enhanced removal of iopamidol and DTZ by UV/chlorine. The oxidation products of iopamidol and DTZ resulting from UV/chlorine and UV/H 2 O 2 process were identified, and differences existed in the two systems. IO 3 - (the desired sink of I - ) was the major inorganic product in the UV/chlorine process whereas I - was the predominant inorganic product in the UV/H 2 O 2 process. The formation of chlorine-containing products during the degradation of iopamidol and DTZ by UV/chlorine was also observed. H-abstraction, additions, de-iodination were shared during the degradation of iopamidol by UV/chlorine and UV/H 2 O 2 . Neutral pH condition was preferred for the removal of iopamidol and DTZ by UV/chlorine. UV/chlorine could also be applied in real waters for the removal of iopamidol and DTZ. Copyright © 2017 Elsevier Ltd. All rights reserved.

A Facile in Situ and UV Printing Process for Bioinspired Self-Cleaning Surfaces

Directory of Open Access Journals (Sweden)

Marina A. González Lazo

2016-08-01

Full Text Available A facile in situ and UV printing process was demonstrated to create self-cleaning synthetic replica of natural petals and leaves. The process relied on the spontaneous migration of a fluorinated acrylate surfactant (PFUA within a low-shrinkage acrylated hyperbranched polymer (HBP and its chemical immobilization at the polymer-air interface. Dilute concentrations of 1 wt. % PFUA saturated the polymer-air interface within 30 min, leading to a ten-fold increase of fluorine concentration at the surface compared with the initial bulk concentration and a water contact angle (WCA of 108°. A 200 ms flash of UV light was used to chemically crosslink the PFUA at the HBP surface prior to UV printing with a polydimethylsiloxane (PDMS negative template of red and yellow rose petals and lotus leaves. This flash immobilization hindered the reverse migration of PFUA within the bulk HBP upon contacting the PDMS template, and enabled to produce texturized surfaces with WCA well above 108°. The synthetic red rose petal was hydrophobic (WCA of 125° and exhibited the adhesive petal effect. It was not superhydrophobic due to insufficient concentration of fluorine at its surface, a result of the very large increase of the surface of the printed texture. The synthetic yellow rose petal was quasi-superhydrophobic (WCA of 143°, roll-off angle of 10° and its self-cleaning ability was not good also due to lack of fluorine. The synthetic lotus leaf did not accurately replicate the intricate nanotubular crystal structures of the plant. In spite of this, the fluorine concentration at the surface was high enough and the leaf was superhydrophobic (WCA of 151°, roll-off angle below 5° and also featured self-cleaning properties.

Inhibitory effects of ambient levels of solar UV-A and UV-B radiation on growth of cucumber

International Nuclear Information System (INIS)

Krizek, D.T.; Mirecki, R.M.; Britz, S.J.

1997-01-01

The influence of solar UV-A and UV-B radiation at Beltsville, Maryland, on growth and flavonoid content in four cultivars of Cucumis sativus L. (Ashley, Poinsett, Marketmore, and Salad Bush cucumber) was examined during the summers of 1994 and 1995. Plants were grown from seed in UV exclusion chambers consisting of UV-transmitting Plexiglas, lined with Llumar to exclude UV-A and UV-B, polyester to exclude UV-B, or cellulose acetate to transmit UV-A and UV-B. Despite previously determined differences in sensitivity to supplemental UV-B radiation, all four cultivars responded similarly to UV-B exclusion treatment. After 19–21 days, the four cultivars grown in the absence of solar UV-B (polyester) had an average of 34, 55, and 40% greater biomass of leaves, stems, and roots, respectively, 27% greater stem height, and 35% greater leaf area than those grown under ambient UV-B (cellulose acetate). Plants protected from UV-A radiation as well (Llumar) showed an additional 14 and 22% average increase, respectively, in biomass of leaves and stems, and a 22 and 19% average increase, respectively, in stem elongation and leaf area over those grown under polyester. These findings demonstrate the extreme sensitivity of cucumber not only to present levels of UV-B but also to UV-A and suggest that even small changes in ozone depletion may have important biological consequences for certain plant species. (author)

UV-MAOR - UV-B-specific reactions of marine planktons. Final report

International Nuclear Information System (INIS)

Gerbersdorf, S.; Steeger, H.U.; Schubert, H.; Paul, R.J.

2001-02-01

An initial finding of the studies performed here is that under certain hydrogeographic and meteorological conditions vertical migration of phyto and zooplankton also occurs in near-shore parts of flat waters. The vertical migration of phytoplankton was induced by exceeding the threshold intensity of approx. 300 μmol photons m -2 s -1 (PAR). However, the sigmoidal course of the reaction of phytoplankton suggests that it is apparently not the PAR intensity alone but the ratio of PAR/UV-B which governs the downward migration. However, the present body of data is not sufficient for a definitive statistical verification of this finding. Light irradiation resulted in an increased density and thus in a reduced buoyancy of flounder spawn. This effect was primarily dependent on intensity and did not increase upon irradiation with UV-B, UV-A and PAR as compared to UV-A and PAR alone. Irradiation with UV-B did not influence the substance located in the vitellus whose absorption maximum was found to be 300 nm, probably gadusol

Damage to UV-sensitive cells by short UV in photographic flashes

International Nuclear Information System (INIS)

Menezes, S.; Monteiro, C.

1996-01-01

Light emitted by electronic photographic flash units is shown to damage bacteria and human skin fibroblasts deficient in repair systems, with survival curves very similar to those produced by 254 nm short UV. The lesions induced by these flashes are as photorepairable by the photolyase enzyme as those induced by 254 nm UV and result in equivalent survival rates. Biological dosimetry performed with microorganisms highly sensitive to UV (Escherichia coli K12 AB2480, deficient in excision and recombinational-dependent repair systems and Bacillus subtilis UVSSP spores, deficient in excision and in a specific spore repair process) revealed that each 1 ms flash of light from the photographic unit used in this work contained the equivalent of 0.25 J m -2 of 254 nm UV, when measured at a distance of 7.0 cm. This dose of UV was found to be lethal to both repair-deficient E. coli bacteria and repair-deficient human skin fibroblasts obtained from xeroderma pigmentosum donors, as well as mutagenic in B/r wild-type and HCR-mutant bacteria. (Author)

Light trapping with plasmonic back contacts in thin-film silicon solar cells

Energy Technology Data Exchange (ETDEWEB)

Paetzold, Ulrich Wilhelm

2013-02-08

small potential for increasing the reflection at the back contact with dielectric interlayers of even lower refractive index, such as SiO{sub 2} and air, is demonstrated. The light-trapping effect of two types of plasmonic back contacts, which make use of large and efficiently scattering Ag nanostructures, is studied in thin-film silicon solar cell prototypes. The first type of plasmonic back contact applies non-ordered Ag nanostructures. The preparation, characterization and three-dimensional electromagnetic simulations of these back contacts with various distributions of non-ordered Ag nanostructures are presented. Measured reflectance spectra of the Ag back contacts with non-ordered nanostructures are correlated with reflectance spectra derived from three-dimensional electromagnetic simulations of isolated nanostructures on Ag back contacts. A microcrystalline silicon solar cell fabricated on one type of plasmonic Ag back contact with non-ordered Ag nanostructures shows a significantly enhanced plasmonic light trapping when compared with a flat solar cell. The second type of plasmonic back contact applies periodic arrangements of plasmonic Ag nanostructures in a square lattice at the surface of the Ag back contact. It is called a plasmonic reflection grating back contact. A particular advantage of this device is the control of the scattering angles via the diffraction orders of the grating while taking advantage of the efficient plasmon-induced light scattering at the Ag nanostructures. The plasmonic reflection grating back contacts are prepared with a nanoimprint process. The prototype microcrystalline silicon solar cells exhibit a very good light-trapping effect. Even in comparison with solar cells with a state-of-the-art random texture for light trapping, an enhanced light-trapping effect is demonstrated for a solar sell with a plasmonic reflection grating of optimized period. Based on electromagnetic simulations, the light-trapping effect is explained from the

UV-induced skin damage

International Nuclear Information System (INIS)

Ichihashi, M.; Ueda, M.; Budiyanto, A.; Bito, T.; Oka, M.; Fukunaga, M.; Tsuru, K.; Horikawa, T.

2003-01-01

Solar radiation induces acute and chronic reactions in human and animal skin. Chronic repeated exposures are the primary cause of benign and malignant skin tumors, including malignant melanoma. Among types of solar radiation, ultraviolet B (290-320 nm) radiation is highly mutagenic and carcinogenic in animal experiments compared to ultraviolet A (320-400 nm) radiation. Epidemiological studies suggest that solar UV radiation is responsible for skin tumor development via gene mutations and immunosuppression, and possibly for photoaging. In this review, recent understanding of DNA damage caused by direct UV radiation and by indirect stress via reactive oxygen species (ROS) and DNA repair mechanisms, particularly nucleotide excision repair of human cells, are discussed. In addition, mutations induced by solar UV radiation in p53, ras and patched genes of non-melanoma skin cancer cells, and the role of ROS as both a promoter in UV-carcinogenesis and an inducer of UV-apoptosis, are described based primarily on the findings reported during the last decade. Furthermore, the effect of UV on immunological reaction in the skin is discussed. Finally, possible prevention of UV-induced skin cancer by feeding or topical use of antioxidants, such as polyphenols, vitamin C, and vitamin E, is discussed

Influence of uvA on the erythematogenic and therapeutic effects of uvB irradiation in psoriasis; photoaugmentation effects

International Nuclear Information System (INIS)

Boer, J.; Schothorst, A.A.; Suurmond, D.

1981-01-01

The effect of repeated exposure to an additive dose of long ultraviolet (uvA) radiation on the erythemogenic and therapeutic effects of middle ultraviolet (uvB) irradiation was investigated in 8 patients with psoriasis. The surface of the backs of these patients was divided into 2 parts, 1 of which received only uvB irradiation 4 times a week and the other uvA + uvB. uvB was provided by Philips TL-12 lamps and uvA by glass-filtered Philips TL-09 lamps. uvA was held constantly at 10 J/cm2, whereas uvB alone were evaluated by 4 tests during the treatment to determine the minimal erythema dose (MED). Test I (at the start of the therapy) showed a photoaugmentative effect which was no longer apparent in Test III (third week). Test III showed a reversal of the ratios of the MEDs of the sites irradiated with the uvA + uvB and uvB (MED A + B/MED B). This is ascribed to the marked pigmentation which appeared after repeated irradiation with the uvA + uvB combination. Comparison showed for the improvement of the psoriasis no distinct differences between uvA + uvB irradiation and uvB alone, but the former had the cosmetic advantage of giving pleasing tan

UV SEDs of early-type cluster galaxies: a new look at the UV upturn

Science.gov (United States)

Ali, S. S.; Bremer, M. N.; Phillipps, S.; De Propris, R.

2018-05-01

Using GALEX, Ultraviolet Optical Telescope (UVOT), and optical photometry, we explore the prevalence and strength of the Ultraviolet (UV) upturn in the spectra of quiescent early-type galaxies in several nearby clusters. Even for galaxies with completely passive optical colours, there is a large spread in vacuum UV colour consistent with almost all having some UV upturn component. Combining GALEX and UVOT data below 3000 Å, we generate for the first time comparatively detailed UV spectral energy distributions for Coma cluster galaxies. Fitting the UV upturn component with a blackbody, 26 of these show a range of characteristic temperatures (10 000-21 000K) for the UV upturn population. Assuming a single temperature to explain GALEX-optical colours could underestimate the fraction of galaxies with UV upturns and mis-classify some as systems with residual star formation. The UV upturn phenomenon is not an exclusive feature found only in giant galaxies; we identify galaxies with similar (or even bluer) FUV - V colours to the giants with upturns over a range of fainter luminosities. The temperature and strength of the UV upturn are correlated with galaxy mass. Under the plausible hypothesis that the sources of the UV upturn are blue horizontal branch stars, the most likely mechanism for this is the presence of a substantial (between 4 per cent and 20 per cent) Helium-rich (Y > 0.3) population of stars in these galaxies, potentially formed at z ˜ 4 and certainly at z > 2; this plausibly sets a lower limit of {˜ } {0.3- 0.8} × 10^{10} M⊙ to the in situ stellar mass of ˜L* galaxies at this redshift.

Degradation of sulfamethoxazole by UV, UV/H2O2 and UV/persulfate (PDS): Formation of oxidation products and effect of bicarbonate.

Science.gov (United States)

Yang, Yi; Lu, Xinglin; Jiang, Jin; Ma, Jun; Liu, Guanqi; Cao, Ying; Liu, Weili; Li, Juan; Pang, Suyan; Kong, Xiujuan; Luo, Congwei

2017-07-01

The frequent detection of sulfamethoxazole (SMX) in wastewater and surface waters gives rise of concerns about their ecotoxicological effects and potential risks to induce antibacterial resistant genes. UV/hydrogen peroxide (UV/H 2 O 2 ) and UV/persulfate (UV/PDS) advanced oxidation processes have been demonstrated to be effective for the elimination of SMX, but there is still a need for a deeper understanding of product formations. In this study, we identified and compared the transformation products of SMX in UV, UV/H 2 O 2 and UV/PDS processes. Because of the electrophilic nature of SO 4 - , the second-order rate constant for the reaction of sulfate radical (SO 4 - ) with the anionic form of SMX was higher than that with the neutral form, while hydroxyl radical (OH) exhibited comparable reactivity to both forms. The direct photolysis of SMX predominately occurred through cleavage of the NS bond, rearrangement of the isoxazole ring, and hydroxylation mechanisms. Hydroxylation was the dominant pathway for the reaction of OH with SMX. SO 4 - favored attack on NH 2 group of SMX to generate a nitro derivative and dimeric products. The presence of bicarbonate in UV/H 2 O 2 inhibited the formation of hydroxylated products, but promoted the formation of the nitro derivative and the dimeric products. In UV/PDS, bicarbonate increased the formation of the nitro derivative and the dimeric products, but decreased the formation of the hydroxylated dimeric products. The different effect of bicarbonate on transformation products in UV/H 2 O 2 vs. UV/PDS suggested that carbonate radical (CO 3 - ) oxidized SMX through the electron transfer mechanism similar to SO 4 - but with less oxidation capacity. Additionally, SO 4 - and CO 3 - exhibited higher reactivity to the oxazole ring than the isoxazole ring of SMX. Ecotoxicity of transformation products was estimated by ECOSAR program based on the quantitative structure-activity relationship analysis as well as by experiments using

The World Space Observatory Ultraviolet (WSO-UV), as a bridge to future UV astronomy

Science.gov (United States)

Shustov, B.; Gómez de Castro, A. I.; Sachkov, M.; Vallejo, J. C.; Marcos-Arenal, P.; Kanev, E.; Savanov, I.; Shugarov, A.; Sichevskii, S.

2018-04-01

Ultraviolet (UV) astronomy is a vital branch of space astronomy. Many dozens of short-term UV-experiments in space, as well as long-term observatories, have brought a very important knowledge on the physics and chemistry of the Universe during the last decades. Unfortunately, no large UV-observatories are planned to be launched by most of space agencies in the coming 10-15 years. Conversely, the large UVOIR observatories of the future will appear not earlier than in 2030s. This paper briefly describes the projects that have been proposed by various groups. We conclude that the World Space Observatory-Ultraviolet (WSO-UV) will be the only 2-m class UV telescope with capabilities similar to those of the HST for the next decade. The WSO-UV has been described in detail in previous publications, and this paper updates the main characteristics of its instruments and the current state of the whole project. It also addresses the major science topics that have been included in the core program of the WSO-UV, making this core program very relevant to the current state of the UV-astronomy. Finally, we also present here the ground segment architecture that will implement this program.

Simulation and comparative study on the oxidation kinetics of atrazine by UV/H₂O₂, UV/HSO₅⁻ and UV/S₂O₈²⁻.

Science.gov (United States)

Luo, Congwei; Ma, Jun; Jiang, Jin; Liu, Yongze; Song, Yang; Yang, Yi; Guan, Yinghong; Wu, Daoji

2015-09-01

This study comparatively investigated atrazine (ATZ) degradation by irradiation at the wavelength of 254 nm in the presence of peroxides including hydrogen peroxide (H2O2), peroxymonosulfate (HSO5(-)), and persulfate (S2O8(2-)) at various initial ATZ concentrations and oxidant dosages. The effects of water matrix, such as carbonate/bicarbonate (HCO3(-)/CO3(2-)), chloride ions (Cl(-)), and natural organic matter (NOM), were evaluated on these three advanced oxidation processes. A simple steady-state kinetic model was developed based on the initial rates of ATZ destruction, which could well describe the apparent pseudo-first-order rate constants (k(app), s(-1)) of ATZ degradation in these three processes. The specific roles of reactive species (i.e., HO·, SO4(-·), CO3(-·), and Cl2(-·)) under various experimental conditions were quantitatively evaluated based on their steady-state concentrations obtained from this model. Modeling results showed that the steady-state concentrations of HO· and SO4(-·) decreased with the increase of CO3(2-)/HCO3(-) concentration, and the relative contribution of HO· to ATZ degradation significantly decreased in UV/H2O2 and UV/HSO5(-) systems. On the other hand, the scavenging effect of HCO3(-)/CO3(2-) on the relative contribution of SO4(-·) to ATZ degradation was lower than that on HO·. The presence of Cl(-) (0.5-10 mM) significantly scavenged SO4(-·) but had slightly scavenging effect on HO· at the present experimental pH, resulting in greater decrease of k(app) in the UV/S2O8(2-) than UV/H2O2 and UV/HSO5(-) systems. Higher levels of Cl2(-·) were generated in the UV/S2O8(2-) than those in the UV/H2O2 and UV/HSO5(-) systems at the same Cl(-) concentrations. NOM significantly decreased k(app) due to its effects of competitive UV absorption and radical scavenging with the latter one being dominant. These results improve the understanding of the effects of water constituents for ATZ degradation in the UV-based oxidation

The optimal UV exposure time for vitamin D3 synthesis and erythema estimated by UV observations in Korea

Science.gov (United States)

Lee, Y. G.; Koo, J. H.

2016-12-01

Solar UV radiation in a wavelength range between 280 to 400 nm has both positive and negative influences on human body. Surface UV radiation is the main natural source of vitamin D, providing the promotion of bone and musculoskeletal health and reducing the risk of a number of cancers and other medical conditions. However, overexposure to surface UV radiation is significantly related with the majority of skin cancer, in addition other negative health effects such as sunburn, skin aging, and some forms of eye cataracts. Therefore, it is important to estimate the optimal UV exposure time, representing a balance between reducing negative health effects and maximizing sufficient vitamin D production. Previous studies calculated erythemal UV and vitamin-D UV from the measured and modelled spectral irradiances, respectively, by weighting CIE Erythema and Vitamin D3 generation functions (Kazantzidis et al., 2009; Fioletov et al., 2010). In particular, McKenzie et al. (2009) suggested the algorithm to estimate vitamin-D production UV from erythemal UV (or UV index) and determined the optimum conditions of UV exposure based on skin type Ⅱ according to the Fitzpatrick (1988). Recently, there are various demands for risks and benefits of surface UV radiation on public health over Korea, thus it is necessary to estimate optimal UV exposure time suitable to skin type of East Asians. This study examined the relationship between erythemally weighted UV (UVEry) and vitamin D weighted UV (UVVitD) from spectral UV measurements during 2006-2010. The temporal variations of the ratio (UVVitD/UVEry) were also analyzed and the ratio as a function of UV index was applied to the broadband UV measured by UV-Biometer at 6 sites in Korea Thus, the optimal UV exposure time for vitamin D3 synthesis and erythema was estimated for diurnal, seasonal, and annual scales over Korea. In summer with high surface UV radiation, short exposure time leaded to sufficient vitamin D and erythema and vice

Comparison of the Efficiency of Simultaneous Application of UV/O3 for the Removal of Organophosphorus and Carbamat Pesticides in Aqueous Solutions

Directory of Open Access Journals (Sweden)

Mohammad Taghi Samadi

2010-03-01

Full Text Available A vast variety of pesticides are used for agricultural pests in Iran. The release of these persistent organic pollutants. into water supplies leaves adverse effects on both the environment and public health. Advanced oxidation processes have been used recently for pesticide removal. In this research, the combined UV/O3 process has been investigated for the removal of organophosphorus pesticides (Diazinon, Chlorpyrifos, Carbamate pesticides (carbaryl. In this survey, samples have been prepared by adding given concentration (1, 5, 10, 15, 20 mg/L of the pesticides to deionized water. The samples at separation periods were exposed to the combined UV/O3 (UV=50-200 Wm-2 and O3 = 1g hr-1in a bath  reactor at different pH levels (6, 7, 9 and for different contact times (0.5,1,1.5,2 hr and the removal efficiencies were determined. Residual concentrations were determined using GC/MS/MS and HPLC.  Based on the results, increasing pH reduced pesticide concentration and increased contact time had a direct effect on enhancing removal efficiency. The combined UV/O3 process was found to have a high efficiency (>80% in degrading both halogenated Organophosphorus(Chlorpyrifos and non- halogenated Organophosphorus (Diazinon pesticides. Its removal efficiency for degrading carbamate pesticide (Carbari was found to be >90%. Based on our results, this method may be suggested for the removal of pesticides from aqueous solutions.

Photodegradation and toxicity changes of antibiotics in UV and UV/H2O2 process

International Nuclear Information System (INIS)

Yuan Fang; Hu Chun; Hu Xuexiang; Wei Dongbin; Chen Yong; Qu Jiuhui

2011-01-01

The photodegradation of three antibiotics, oxytetracycline (OTC), doxycycline (DTC), and ciprofloxacin (CIP) in UV and UV/H 2 O 2 process was investigated with a low-pressure UV lamp system. Experiments were performed in buffered ultrapure water (UW), local surface water (SW), and treated water from local municipal drinking water treatment plant (DW) and wastewater treatment plant (WW). The efficiency of UV/H 2 O 2 process was affected by water quality. For all of the three selected antibiotics, the fastest degradation was observed in DW, and the slowest degradation occurred in WW. This phenomenon can be explained by R OH,UV , defined as the experimentally determined ·OH radical exposure per UV fluence. The R OH,UV values represent the background ·OH radical scavenging in water matrix, obtained by the degradation of para-chlorobenzoic acid (pCBA), a probe compound. In natural water, the indirect degradation of CIP did not significantly increase with the addition of H 2 O 2 due to its effective degradation by UV direct photolysis. Moreover, the formation of several photoproducts and oxidation products of antibiotics in UV/H 2 O 2 process was identified using GC-MS. Toxicity assessed by Vibrio fischer (V. fischer), was increased in UV photolysis, for the photoproducts still preserving the characteristic structure of the parent compounds. While in UV/H 2 O 2 process, toxicity increased first, and then decreased; nontoxic products were formed by the oxidation of ·OH radical. In this process, detoxification was much easier than mineralization for the tested antibiotics, and the optimal time for the degradation of pollutants in UV/H 2 O 2 process would be determined by parent compound degradation and toxicity changes.

TEMIS UV product validation using NILU-UV ground-based measurements in Thessaloniki, Greece

Science.gov (United States)

Zempila, Melina-Maria; van Geffen, Jos H. G. M.; Taylor, Michael; Fountoulakis, Ilias; Koukouli, Maria-Elissavet; van Weele, Michiel; van der A, Ronald J.; Bais, Alkiviadis; Meleti, Charikleia; Balis, Dimitrios

2017-06-01

This study aims to cross-validate ground-based and satellite-based models of three photobiological UV effective dose products: the Commission Internationale de l'Éclairage (CIE) erythemal UV, the production of vitamin D in the skin, and DNA damage, using high-temporal-resolution surface-based measurements of solar UV spectral irradiances from a synergy of instruments and models. The satellite-based Tropospheric Emission Monitoring Internet Service (TEMIS; version 1.4) UV daily dose data products were evaluated over the period 2009 to 2014 with ground-based data from a Norsk Institutt for Luftforskning (NILU)-UV multifilter radiometer located at the northern midlatitude super-site of the Laboratory of Atmospheric Physics, Aristotle University of Thessaloniki (LAP/AUTh), in Greece. For the NILU-UV effective dose rates retrieval algorithm, a neural network (NN) was trained to learn the nonlinear functional relation between NILU-UV irradiances and collocated Brewer-based photobiological effective dose products. Then the algorithm was subjected to sensitivity analysis and validation. The correlation of the NN estimates with target outputs was high (r = 0. 988 to 0.990) and with a very low bias (0.000 to 0.011 in absolute units) proving the robustness of the NN algorithm. For further evaluation of the NILU NN-derived products, retrievals of the vitamin D and DNA-damage effective doses from a collocated Yankee Environmental Systems (YES) UVB-1 pyranometer were used. For cloud-free days, differences in the derived UV doses are better than 2 % for all UV dose products, revealing the reference quality of the ground-based UV doses at Thessaloniki from the NILU-UV NN retrievals. The TEMIS UV doses used in this study are derived from ozone measurements by the SCIAMACHY/Envisat and GOME2/MetOp-A satellite instruments, over the European domain in combination with SEVIRI/Meteosat-based diurnal cycle of the cloud cover fraction per 0. 5° × 0. 5° (lat × long) grid cells. TEMIS

TEMIS UV product validation using NILU-UV ground-based measurements in Thessaloniki, Greece

Directory of Open Access Journals (Sweden)

M.-M. Zempila

2017-06-01

Full Text Available This study aims to cross-validate ground-based and satellite-based models of three photobiological UV effective dose products: the Commission Internationale de l'Éclairage (CIE erythemal UV, the production of vitamin D in the skin, and DNA damage, using high-temporal-resolution surface-based measurements of solar UV spectral irradiances from a synergy of instruments and models. The satellite-based Tropospheric Emission Monitoring Internet Service (TEMIS; version 1.4 UV daily dose data products were evaluated over the period 2009 to 2014 with ground-based data from a Norsk Institutt for Luftforskning (NILU-UV multifilter radiometer located at the northern midlatitude super-site of the Laboratory of Atmospheric Physics, Aristotle University of Thessaloniki (LAP/AUTh, in Greece. For the NILU-UV effective dose rates retrieval algorithm, a neural network (NN was trained to learn the nonlinear functional relation between NILU-UV irradiances and collocated Brewer-based photobiological effective dose products. Then the algorithm was subjected to sensitivity analysis and validation. The correlation of the NN estimates with target outputs was high (r = 0. 988 to 0.990 and with a very low bias (0.000 to 0.011 in absolute units proving the robustness of the NN algorithm. For further evaluation of the NILU NN-derived products, retrievals of the vitamin D and DNA-damage effective doses from a collocated Yankee Environmental Systems (YES UVB-1 pyranometer were used. For cloud-free days, differences in the derived UV doses are better than 2 % for all UV dose products, revealing the reference quality of the ground-based UV doses at Thessaloniki from the NILU-UV NN retrievals. The TEMIS UV doses used in this study are derived from ozone measurements by the SCIAMACHY/Envisat and GOME2/MetOp-A satellite instruments, over the European domain in combination with SEVIRI/Meteosat-based diurnal cycle of the cloud cover fraction per 0. 5° × 0. 5�

Photostability of cosmetic UV filters on mammalian skin under UV exposure.

Science.gov (United States)

Stiefel, Constanze; Schwack, Wolfgang; Nguyen, Yen-Thi Hai

2015-01-01

Previous studies showed that the common UV filter substances benzophenone-3 (BP-3), butyl methoxydibenzoylmethane (BM-DBM), octocrylene (OCR), ethylhexyl methoxycinnamate (EHMC), ethylhexyl salicylate (EHS) and ethylhexyl triazone (EHT) were able to react with amino side chains of different proteins in vitro. To transfer the results to mammalian skin conditions, sunscreen products were applied on both prepared fresh porcine skin and glass plates, followed by UV irradiation and the determination of depletion of the respective UV filters. Significantly lower recoveries of the UV filters extracted from skin samples than from glass plates indicated the additional reaction of the UV filters with skin constituents, when proteins will be the most important reactants. Among the products tested, BP-3 showed the greatest differences in recoveries between glass and skin samples of about 13% and 24% after 2 and 4 h of irradiation, respectively, followed by EHS > BM-DBM > OCR > EHMC > EHT. The obtained results raise the question, whether the common in vitro evaluations of sunscreens, using inert substrate materials like roughened quartz or polymethyl methacrylate (PMMA) plates are really suitable to fully replace in vivo methods, as they cannot include skin-typical reactions. © 2014 The American Society of Photobiology.

Effect of UV on DNA synthesis in UV-resistant insect cells

International Nuclear Information System (INIS)

Styer, S.C.; Meechan, P.J.; Griffiths, T.D.

1987-01-01

Insect cells are most resistant to killing by 254 nm ultraviolet light (UV) than mammalian cells. Because they have an active photolyase, it may be possible to generate a higher number of [6-4] PyC lesions per genome, allowing the possibility to distinguish between the effects of [5-6] pyrimidine lesions and the nonphotoreactable [6-4] lesions on DNA replication. IAL-PID2 cells, derived from imaginal wing discs of the Indian meal moth were exposed to UV followed by photoreactivating light (PR) or sham treatment and then analyzed by measuring the incorporation of [/sup 3/H]-thymidine into acid precipitable form. As expected, there was a fluence-dependent decrease in the amount of thymidine incorporated after exposure to UV. The response was similar to that observed in wild type CHO cells (AAS) except that the rate of decline was more rapid. When PR followed UV, there was less of a decline in thymidine incorporation and a more rapid recovery. However, thymidine incorporation did not return to control levels as rapidly as expected if [5-6] lesions were the only lesions involved in the disruption of DNA synthesis after exposure to UV

The UV Sensor Onboard the Mars Science Laboratory Mission: Correction and Generation of UV Fluxes

Science.gov (United States)

Vicente-Retortillo, Á.; Martinez, G.; Renno, N. O.; Lemmon, M. T.; Gomez-Elvira, J.

2017-12-01

The Rover Environmental Monitoring Station UV sensor (UVS) onboard the Mars Science Laboratory mission has completed more than 1750 sols of measurements, providing an unprecedented coverage ranging from diurnal to interannual times scales [1,2]. The UVS is comprised of six photodiodes to measure the UV flux in the ranges 200-380, 320-380, 280-320, 200-280, 230-290 and 300-350 nm [3]. UV fluxes in units of W/m2 can be found in the NASA Planetary Data System (PDS). However, dust deposition on the UVS and a non-physical discontinuity in the calibration functions when the solar zenith angle is above 30º cause errors in these fluxes that increase with time. We have developed a technique to correct UV fluxes from the effects of dust degradation and inconsistencies in the angular response of the UVS. The photodiode output currents (available in the PDS as lower-level TELRDR products), ancillary data records (available in the PDS as ADR products) and dust opacity values derived from Mastcam observations are used for performing the corrections. The corrections have been applied to the UVA band (320-380 nm) for the first 1000 sols of the mission, providing excellent results [4]. We plan to correct the UV fluxes on each of the six UVS bands and to make these results available in the PDS. Data products generated by this study will allow comparisons of the UV radiation environment at Gale crater with that at the locations of the future missions ExoMars 2020 and Mars 2020, as well as the assessment of the potential survivability of biological contaminants brought to Mars from Earth. References: [1] Smith, M. D., et al. (2016), Aerosol optical depth as observed by the Mars Science Laboratory REMS UV photodiodes, Icarus, 280, 234-248. [2] Vicente-Retortillo, Á., et al. (2017), Determination of dust aerosol particle size at Gale Crater using REMS UVS and Mastcam measurements, Geophys. Res. Lett., 44, 3502-3508. [3] Gómez-Elvira, J., et al. (2012), REMS: The environmental sensor

UV-induced effects

NARCIS (Netherlands)

Liebsch, M.; Spielmann, H.; Pape, W.; Krul, C.; Deguercy, A.; Eskes, C.A.M.

2005-01-01

Regulatory requirements: According to the current Notes for Guidance of the Scientific Committee on Cosmetic Products and Non-Food Products (SCCNFP), cosmetic ingredients and mixtures of ingredients absorbing UV light (in particular UV filter chemicals used, for example, to ensure the light

Monitoring and control of UV and UV-TiO2 disinfections for municipal wastewater reclamation using artificial neural networks

International Nuclear Information System (INIS)

Lin, Chuang-Hung; Yu, Ruey-Fang; Cheng, Wen-Po; Liu, Chun-Ru

2012-01-01

Highlights: ► ANN models can effectively control both UV and UV-TiO 2 disinfections for wastewater reuse. ► Comparing to UV disinfection, UV-TiO 2 disinfection can save 13.2–15.7% of UV dosage and capacity. ► SS decreases disinfection efficiency when UV doses were 2 . - Abstract: The use of ultraviolet (UV) irradiation as a physical wastewater disinfection has increased in recent years, especially for wastewater reuse. The UV-TiO 2 can generate OH radicals, which is highly effective to inactivate microorganisms in wastewater disinfection. However, both UV and UV-TiO 2 disinfections create multiple physical, chemical, and bio-chemical phenomena that affect their germicidal efficiency. It is difficult to build a precise control model using existing mathematic models. This study applies artificial neural network (ANN) models to control UV and UV-TiO 2 disinfections. Experimental results indicate that the ANN models, which precisely generate relationships among multiple monitored parameters, total coliform counts in influent and effluent, and UV doses, can be used as control models for UV and UV-TiO 2 disinfections. A novel ANN control strategy is applied to control UV and UV-TiO 2 disinfection processes to meet three total coliform count limits for three wastewater reuse purposes. The proposed controlled strategy effectively controls UV and UV-TiO 2 disinfection, resulting in acceptable total coliform counts in effluent for the three wastewater reuse purposes. The required UV doses for UV-TiO 2 disinfection were lower than those for UV disinfection, resulting in energy saving and capacity reduction of 13.2–15.7%.

Skin Cancer and UV Protection

Directory of Open Access Journals (Sweden)

Tarbuk Anita

2016-03-01

Full Text Available The incidence of skin cancer is increasing by epidemic proportions. Basal cell cancer remains the most common skin neoplasm, and simple excision is generally curative. On the other hand, aggressive local growth and metastasis are common features of malignant melanoma, which accounts for 75% of all deaths associated with skin cancer. The primary cause of skin cancer is long exposure to solar ultraviolet radiation (UV-R crossed with the amount of skin pigmentation and family genetics. It is believed that in childhood and adolescence, 80% of UV-R gets absorbed while in the remaining, 20 % gets absorbed later in the lifetime. This suggests that proper and early photoprotection may reduce the risk of subsequent occurrence of skin cancer. Reducing the exposure time to sunlight, using sunscreens and protective textiles are the three ways of UV protection. Most people think that all the clothing will protect them, but it does not provide full sun screening properties. Literature sources claim that only 1/3 of the spring and summer collections tested give off proper UV protection. This is very important during the summer months, when UV index is the highest. Fabric UV protection ability highly depends on large number of factors such as type of fiber, fabric surface, construction, porosity, density, moisture content, type and concentration of dyestuff, fluorescent whitening agents, UV-B protective agents (UV absorbers, as well as nanoparticles, if applied. For all of these reasons, in the present paper, the results of UV protecting ability according to AS/NZS 4399:1996 will be discussed to show that standard clothing materials are not always adequate to prevent effect of UV-R to the human skin; and to suggest the possibilities for its improvement for this purpose enhancing light conversion and scattering. Additionally, the discrepancy in UV protection was investigated in distilled water as well as Adriatic Sea water.

Specific inhibition of cytotoxic memory cells produced against uv-induced tumors in uv-irradiation mice

International Nuclear Information System (INIS)

Thorn, R.M.

1978-01-01

Cytotoxic responses of uv-irradiated mice against syngeneic uv-induced tumors were measured by using a 51 Cr-release assay to determine if uv treatment induced a specific reduction of cytotoxic activity. The in vivo and in vitro primary responses against syngeneic tumors and allogeneic cells were unaffected, as was the ''memory'' response (in vivo stimulation, in vitro restimulation) against alloantigens. In contrast, the memory response of uv-treated mice against syngeneic, uv-induced tumors was consistently and significantly depressed. The cytotoxicity generated by tumor cell stimulation in vivo or in vitro was tumor-specific and T cell-dependent. Since the primary response against syngeneic uv-induced tumors produces apparently normal amounts of tumor-specific cytotoxic activity, uv-treated mice may not reject transplanted syngeneic tumors because of too few T effector memory cells. These results imply that, at least in this system, tumor rejection depends mostly on the secondary responses against tumor antigens and that at least one carcinogen can, indirectly, specifically regulate immune responses

The mechanisms of UV mutagenesis

International Nuclear Information System (INIS)

Ikehata, Hironobu; Ono, Tetsuya

2011-01-01

Ultraviolet (UV) light induces specific mutations in the cellular and skin genome such as UV-signature and triplet mutations, the mechanism of which has been thought to involve translesion DNA synthesis (TLS) over UV-induced DNA base damage. Two models have been proposed: ''error-free'' bypass of deaminated cytosine-containing cyclobutane pyrimidine dimers (CPDs) by DNA polymerase η, and error-prone bypass of CPDs and other UV-induced photolesions by combinations of TLS and replicative DNA polymerases-the latter model has also been known as the two-step model, in which the cooperation of two (or more) DNA polymerases as misinserters and (mis)extenders is assumed. Daylight UV induces a characteristic UV-specific mutation, a UV-signature mutation occurring preferentially at methyl-CpG sites, which is also observed frequently after exposure to either UVB or UVA, but not to UVC. The wavelengths relevant to the mutation are so consistent with the composition of daylight UV that the mutation is called solar-UV signature, highlighting the importance of this type of mutation for creatures with the cytosine-methylated genome that are exposed to the sun in the natural environment. UVA has also been suggested to induce oxidative types of mutation, which would be caused by oxidative DNA damage produced through the oxidative stress after the irradiation. Indeed, UVA produces oxidative DNA damage not only in cells but also in skin, which, however, does not seem sufficient to induce mutations in the normal skin genome. In contrast, it has been demonstrated that UVA exclusively induces the solar-UV signature mutations in vivo through CPD formation. (author)

Fabrication of Photonic Crystal Structures on Flexible Organic Light-Emitting Diodes by Using Nano-Imprint and PDMS Mold

Directory of Open Access Journals (Sweden)

Ho Ting-Lin

2016-01-01

Full Text Available In this paper, nanoimprint lithography was used to create a photonic crystals structure film in organic light-emitting diode (OLED component, and then compare the efficiency of components whether with nanostructure or not. By using two different kinds of mold, such as silicon mold and PDMS mold, the nano structures in PMMA (molecular weight of 350K were fabricated. Nanostructures in period of 403.53nm with silicon mold and nano structures in period of 385.64nm with PDMS mold as photonic crystal films were fabricated and were integrated into OLED. In experimental results, the OLED without photonic crystal films (with packing behaves 193.3cd/m2 for luminous intensity, 3.481cd/A for lightening efficiency (ηL and 0.781 lm/W for lightening power (ηP where V is 14V and I is 5.5537mA; the OLED with photonic crystal films (with packing behaves 241.6cd/m2 for luminous intensity, 4.173cd/A for lightening efficiency (ηL and 0.936 lm/W for lightening power (ηP where voltage of 14V and current (I of 5.7891mA, which shows that the latter perform is well.

Antiradiation UV Vaccine: UV Radiation, Biological effects, lesions and medical management - immune-therapy and immune-protection.

Science.gov (United States)

Popov, Dmitri; Jones, Jeffrey; Maliev, Slava

Key Words: Ultraviolet radiation,Standard Erythema Dose(SED), Minimal Erythema Dose(MED), Sun Burns, Solar Dermatitis, Sun Burned Disease, DNA Damage,Cell Damage, Antiradiation UV Vaccine, Immune-Prophylaxis of Sun Burned Diseases, Immune-Prophylaxis of Sun Burns, Immune-Therapy of Sun-Burned Disease and Sun Burns,Basal Cell Carcinoma (BCC), Squamous Cell Carcinoma (SCC), Toxic Epidermal Necrolysis(TEN). Introduction: High doses of UV generated by solar source and artificial sources create an exposure of mammals and other species which can lead to ultraviolet(UV)radiation- associated disease (including erythema, epilation, keratitis, etc.). UV radiation belongs to the non-ionizing part of the electromagnetic spectrum and ranges between 100 nm and 400 nm with 100 nm having been chosen arbitrarily as the boundary between non-ionizing and ionizing radiation, however EMR is a spectrum and UV can produce molecular ionization. UV radiation is conventionally categorized into 3 areas: UV-A (>315-400 nm),UV-B (>280-315 nm)and UV-C (>100-280 nm) [IARC,Working Group Reports,2005] An important consequence of stratospheric ozone depletion is the increased transmission of solar ultraviolet (UV)radiation to the Earth's lower atmosphere and surface. Stratospheric ozone levels have been falling, in certain areas, for the past several decades, so current surface ultraviolet-B (UV-B) radiation levels are thought to be close to their modern day maximum. [S.Madronich et al.1998] Overexposure of ultraviolet radiation a major cause of skin cancer including basal cell carcinoma (BCC), squamous cell carcinoma (SCC) { collectively referred to as “non-melanoma" skin cancer (NMSC) and melanoma as well, with skin cancers being the most common cancer in North America. [Armstrong et al. 1993, Gallagher et al. 2005] Methods and Experimental Design: Our experiments and testing of a novel UV “Antiradiation Vaccine” have employed a wide variety of laboratory animals which include : Chinchilla

UV-LIGA technique for ECF micropumps using back UV exposure and self-alignment

Science.gov (United States)

Han, D.; Xia, Y.; Yokota, S.; Kim, J. W.

2017-12-01

This paper proposes and develops a novel UV-LIGA technique using back UV exposure and self-alignment to realize high aspect ratio micromachining (HARM) in high power density electro-conjugate fluid (ECF) micropumps. ECF is a functional fluid designed to be able to generate strong and active jet flow (ECF jetting) between anode and cathode in ECF when high DC voltage is applied. We have developed high power density ECF micropumps consisting of triangular prism and slit electrode pairs (TPSEs) fabricated by HARM. The traditional UV-LIGA technique for HARM is mainly divided into two approaches: (a) single thick layer and (b) multiple thin layers. Both methods have limitations—deformed molds in the former and misalignment between layers in the latter. Using the finite element method software COMSOL Multiphysics, we demonstrate that the deformed micro-molds critically impair the performance of ECF micropumps. In addition, we experimentally prove that the misalignment would easily trigger electric discharge in the ECF micropumps. To overcome these limitations, we conceive a new concept utilizing the seed electrode layer for electroforming as the UV shield and pattern photoresist (KMPR) by back UV exposure. The seed electrode layer should be composed of a non-transparent conductor (Au/Ti) for patterning and a transparent conductor (ITO) for wiring. Instead of ITO, we propose the concept of transparency-like electrodes comprised of thin metal line patterns. To verify this concept, KMPR layers with thicknesses of 70, 220, and 500 µm are experimentally investigated. In the case of 500 µm KMPR thickness, the concept of transparency-like electrode was partially proved. As a result, TPSEs with a height of 440 µm were successfully fabricated. Characteristic experiments demonstrated that ECF micropumps (367 mW cm-3) fabricated by back UV achieved almost the same output power density as ECF micropumps (391 mW cm-3) fabricated by front UV. This paper proves that the proposed

UV-LIGA technique for ECF micropumps using back UV exposure and self-alignment

International Nuclear Information System (INIS)

Han, D; Xia, Y; Yokota, S; Kim, J W

2017-01-01

This paper proposes and develops a novel UV-LIGA technique using back UV exposure and self-alignment to realize high aspect ratio micromachining (HARM) in high power density electro-conjugate fluid (ECF) micropumps. ECF is a functional fluid designed to be able to generate strong and active jet flow (ECF jetting) between anode and cathode in ECF when high DC voltage is applied. We have developed high power density ECF micropumps consisting of triangular prism and slit electrode pairs (TPSEs) fabricated by HARM. The traditional UV-LIGA technique for HARM is mainly divided into two approaches: (a) single thick layer and (b) multiple thin layers. Both methods have limitations—deformed molds in the former and misalignment between layers in the latter. Using the finite element method software COMSOL Multiphysics, we demonstrate that the deformed micro-molds critically impair the performance of ECF micropumps. In addition, we experimentally prove that the misalignment would easily trigger electric discharge in the ECF micropumps. To overcome these limitations, we conceive a new concept utilizing the seed electrode layer for electroforming as the UV shield and pattern photoresist (KMPR) by back UV exposure. The seed electrode layer should be composed of a non-transparent conductor (Au/Ti) for patterning and a transparent conductor (ITO) for wiring. Instead of ITO, we propose the concept of transparency-like electrodes comprised of thin metal line patterns. To verify this concept, KMPR layers with thicknesses of 70, 220, and 500 µ m are experimentally investigated. In the case of 500 µ m KMPR thickness, the concept of transparency-like electrode was partially proved. As a result, TPSEs with a height of 440 µ m were successfully fabricated. Characteristic experiments demonstrated that ECF micropumps (367 mW cm −3 ) fabricated by back UV achieved almost the same output power density as ECF micropumps (391 mW cm −3 ) fabricated by front UV. This paper proves that the

Effect of coupled UV-A and UV-C LEDs on both microbiological and chemical pollution of urban wastewaters

International Nuclear Information System (INIS)

Chevremont, A.-C.; Farnet, A.-M.; Coulomb, B.; Boudenne, J.-L.

2012-01-01

Wastewater reuse for irrigation is an interesting alternative for many Mediterranean countries suffering from water shortages. The development of new technologies for water recycling is a priority for these countries. In this study we test the efficiency of UV-LEDs (Ultraviolet-Light-Emitting Diodes) emitting UV-A or UV-C radiations, used alone or coupled, on bacterial and chemical indicators. We monitored the survival of fecal bioindicators found in urban wastewaters and the oxidation of creatinine and phenol which represent either conventional organic matter or the aromatic part of pollution respectively. It appears that coupling UV-A/UV-C i) achieves microbial reduction in wastewater more efficiently than when a UV-LED is used alone, and ii) oxidizes up to 37% of creatinine and phenol, a result comparable to that commonly obtained with photoreactants such as TiO 2 . - Highlights: ► We test UV-LEDs as an urban wastewater tertiary treatment. ► UV-A and UV-C are coupled, combining germicidal and oxidative properties of UV. ► Coupled wavelengths have the most efficient bactericidal effect. ► Coupling UV-A and UV-C leads to photooxidation of creatinine and phenol.

UV-sensitivity and repair of UV-damage in Salmonella of wild type

International Nuclear Information System (INIS)

Kondratiev, Y.S.; Brukhansky, G.V.; Andreeva, I.V.; Skavronskaya, A.G.

1977-01-01

The UV-sensitivity of wild type Salmonella strains has been compared to that of wild type E.coli and its UV-sensitive mutants. Many wild type Salmonella strains are 4-5 times more sensitive than wild type E.coli and their inactivation curve is similar to that for E.coli with a mutation in the polA gene. Alkaline sucrose gradient centrifugation has shown a deficiency of these strains in normal excision repair of UV-damaged DNA. This deficiency is not a Salmonella genus feature because one strain as resistant as wild type E.coli was found. This resistant strain showed normal excision repair in alkaline sucrose gradient centrifugation experiments. The possible influence of plasmids and mutations in repair genes on the ability of Salmonella to repair UV-damaged DNA is discussed. (orig.) [de

UV-sensitivity and repair of UV-damage in Salmonella of wild type

Energy Technology Data Exchange (ETDEWEB)

Kondratiev, Y S; Brukhansky, G V; Andreeva, I V; Skavronskaya, A G [Akademiya Meditsinskikh Nauk SSSR, Moscow. Inst. Ehpidemiologii i Mikrobiologii

1977-12-01

The UV-sensitivity of wild type Salmonella strains has been compared to that of wild type E.coli and its UV-sensitive mutants. Many wild type Salmonella strains are 4-5 times more sensitive than wild type E.coli and their inactivation curve is similar to that for E.coli with a mutation in the polA gene. Alkaline sucrose gradient centrifugation has shown a deficiency of these strains in normal excision repair of UV-damaged DNA. This deficiency is not a Salmonella genus feature because one strain as resistant as wild type E.coli was found. This resistant strain showed normal excision repair in alkaline sucrose gradient centrifugation experiments. The possible influence of plasmids and mutations in repair genes on the ability of Salmonella to repair UV-damaged DNA is discussed.

Ground testing and flight demonstration of charge management of insulated test masses using UV-LED electron photoemission

Science.gov (United States)

Saraf, Shailendhar; Buchman, Sasha; Balakrishnan, Karthik; Lui, Chin Yang; Soulage, Michael; Faied, Dohy; Hanson, John; Ling, Kuok; Jaroux, Belgacem; Suwaidan, Badr Al; AlRashed, Abdullah; Al-Nassban, Badr; Alaqeel, Faisal; Harbi, Mohammed Al; Salamah, Badr Bin; Othman, Mohammed Bin; Qasim, Bandar Bin; Alfauwaz, Abdulrahman; Al-Majed, Mohammed; DeBra, Daniel; Byer, Robert

2016-12-01

The UV-LED mission demonstrates the precise control of the potential of electrically isolated test masses. Test mass charge control is essential for the operation of space accelerometers and drag-free sensors which are at the core of geodesy, aeronomy and precision navigation missions as well as gravitational wave experiments and observatories. Charge management using photoelectrons generated by the 254 nm UV line of Hg was first demonstrated on Gravity Probe B and is presently part of the LISA Pathfinder technology demonstration. The UV-LED mission and prior ground testing demonstrates that AlGaN UVLEDs operating at 255 nm are superior to Hg lamps because of their smaller size, lower power draw, higher dynamic range, and higher control authority. We show laboratory data demonstrating the effectiveness and survivability of the UV-LED devices and performance of the charge management system. We also show flight data from a small satellite experiment that was one of the payloads on KACST’s SaudiSat-4 mission that demonstrates ‘AC charge control’ (UV-LEDs and bias are AC modulated with adjustable relative phase) between a spherical test mass and its housing. The result of the mission brings the UV-LED device Technology Readiness Level (TRL) to TRL-9 and the charge management system to TRL-7. We demonstrate the ability to control the test mass potential on an 89 mm diameter spherical test mass over a 20 mm gap in a drag-free system configuration, with potential measured using an ultra-high impedance contact probe. Finally, the key electrical and optical characteristics of the UV-LEDs showed less than 7.5% change in performance after 12 months in orbit.

Row orientation effect on UV-B, UV-A and PAR solar irradiation components in vineyards at Tuscany, Italy

Science.gov (United States)

Grifoni, D.; Carreras, G.; Zipoli, G.; Sabatini, F.; Dalla Marta, A.; Orlandini, S.

2008-11-01

Besides playing an essential role in plant photosynthesis, solar radiation is also involved in many other important biological processes. In particular, it has been demonstrated that ultraviolet (UV) solar radiation plays a relevant role in grapevines ( Vitis vinifera) in the production of certain important chemical compounds directly responsible for yield and wine quality. Moreover, the exposure to UV-B radiation (280-320 nm) can affect plant-disease interaction by influencing the behaviour of both pathogen and host. The main objective of this research was to characterise the solar radiative regime of a vineyard, in terms of photosynthetically active radiation (PAR) and UV components. In this analysis, solar spectral UV irradiance components, broadband UV (280-400 nm), spectral UV-B and UV-A (320-400 nm), the biological effective UVBE, as well as the PAR (400-700 nm) component, were all considered. The diurnal patterns of these quantities and the UV-B/PAR and UV-B/UV-A ratios were analysed to investigate the effect of row orientation of the vineyard in combination with solar azimuth and elevation angles. The distribution of PAR and UV irradiance at various heights of the vertical sides of the rows was also studied. The results showed that the highest portion of plants received higher levels of daily radiation, especially the UV-B component. Row orientation of the vines had a pronounced effect on the global PAR received by the two sides of the rows and, to a lesser extent, UV-A and UV-B. When only the diffused component was considered, this geometrical effect was greatly attenuated. UV-B/PAR and UV-A/PAR ratios were also affected, with potential consequences on physiological processes. Because of the high diffusive capacity of the UV-B radiation, the UV-B/PAR ratio was significantly lower on the plant portions exposed to full sunlight than on those in the shade.

The UV Survey Mission Concept, CETUS

Science.gov (United States)

Heap, Sara; and the CETUS Team

2018-01-01

In March 2017, NASA selected CETUS for study of a Probe-class mission concept. W. Danchi is the CETUS PI, and S. Heap is the Science PI. CETUS is primarily a UV survey telescope to complement survey telescopes of the 2020’s including E-ROSITA, Subaru Hyper Suprime Cam and Prime-Focus Spectrograph, WFIRST, and the Square Kilometer Array. CETUS comprises a 1.5-m wide-field telescope and three science instruments: a wide-field (1045” on a side) far-UV and near-UV camera; a similarly wide-field near-UV multi-object spectrograph utilizing a next-generation micro-shutter array; and a single-object spectrograph with options of spectral region (far-UV or near-UV) and spectral resolving power (2,000 or 40,000). The survey instruments will operate simultaneously thereby producing wide-field images in the near-UV and far-UV and a spectrogram containing near-UV spectra of up to 100 sources free of spectral overlap and astronomical background. ln concert with other survey telescopes, CETUS will focus on understanding galaxy evolution at cosmic noon (z~1-2).

Formation Process and Properties of Ohmic Contacts Containing Molybdenum to AlGaN/GaN Heterostructures

Directory of Open Access Journals (Sweden)

Wojciech Macherzynski

2016-01-01

Full Text Available Properties of wide bandgap semiconductors as chemical inertness to harsh conditions and possibility of working at high temperature ensure possible applications in the field as military, aerospace, automotive, engine monitoring, flame detection and solar UV detection. Requirements for ohmic contacts in semiconductor devices are determined by the proposed application. These contacts to AlGaN/GaN heterostructure for application as high temperature, high frequency and high power devices have to exhibit good surface morphology and low contact resistance. The latter is a crucial factor in limiting the development of high performance AlGaN/GaN devices. Lowering of the resistance is assured by rapid thermal annealing process. The paper present studies of Ti/Al/Mo/Au ohmic contacst annealed at temperature range from 825°C to 885°C in N2 atmosphere. The electrical parameters of examined samples as a function of the annealing process condition have been studied. Initially the annealing temperature increase caused lowering of the contacts resistance. The lowest value was noticed for the temperature of annealing equal to 885°C. Further increase of annealing temperature led to deterioration of contact resistance of investigated ohmic contacts.

Removal of Organic Dyes from Industrial Wastewaters Using UV/H2O2, UV/H2O2/Fe (II, UV/H2O2/Fe (III Processes

Directory of Open Access Journals (Sweden)

Nezamaddin Daneshvar

2007-03-01

Full Text Available UV/H2O2, UV/H2O2/Fe (II and UV/H2O2/Fe (III processes are very effective in removing pollutants from wastewater and can be used for treatment of dyestuff units wastewaters. In this study, Rhodamine B was used as a typical organic dye. Rhodamine B has found wide applications in wax, leather, and paper industries. The results from this study showed that this dye was degradable in the presence of hydrogen peroxide under UV-C irradiation (30W mercury light and Photo-Fenton process. The dye was resistant to UV irradiation. In the absence of UV irradiation, the decolorization efficiency was very negligible in the presence of hydrogen. The effects of different system variables such as initial dye concentration, duration of UV irradiation, and initial hydrogen peroxide concentration were investigated in the UV/H2O2 process. Investigation of the kinetics of the UV/H2O2 process showed that the semi-log plot of the dye concentration versus time was linear, suggesting a first order reaction. It was found that Rhodamine B decolorization efficiencies in the UV/H2O2/Fe (II and UV/H2O2/Fe (III processes were higher than that in the UV/H2O2 process. Furthermore, a solution containing 20 ppm of Rhodamine B was decolorized in the presence 18 mM of H2O2 under UV irradiation for 15 minutes. It was also found that addition of 0.1 mM Fe(II or Fe(III to the solution containing  20  ppm of the dye and 5 mM H2O2 under UV light  illumination decreased removal time to 10 min.

UV-Induced Cell Death in Plants

Science.gov (United States)

Nawkar, Ganesh M.; Maibam, Punyakishore; Park, Jung Hoon; Sahi, Vaidurya Pratap; Lee, Sang Yeol; Kang, Chang Ho

2013-01-01

Plants are photosynthetic organisms that depend on sunlight for energy. Plants respond to light through different photoreceptors and show photomorphogenic development. Apart from Photosynthetically Active Radiation (PAR; 400–700 nm), plants are exposed to UV light, which is comprised of UV-C (below 280 nm), UV-B (280–320 nm) and UV-A (320–390 nm). The atmospheric ozone layer protects UV-C radiation from reaching earth while the UVR8 protein acts as a receptor for UV-B radiation. Low levels of UV-B exposure initiate signaling through UVR8 and induce secondary metabolite genes involved in protection against UV while higher dosages are very detrimental to plants. It has also been reported that genes involved in MAPK cascade help the plant in providing tolerance against UV radiation. The important targets of UV radiation in plant cells are DNA, lipids and proteins and also vital processes such as photosynthesis. Recent studies showed that, in response to UV radiation, mitochondria and chloroplasts produce a reactive oxygen species (ROS). Arabidopsis metacaspase-8 (AtMC8) is induced in response to oxidative stress caused by ROS, which acts downstream of the radical induced cell death (AtRCD1) gene making plants vulnerable to cell death. The studies on salicylic and jasmonic acid signaling mutants revealed that SA and JA regulate the ROS level and antagonize ROS mediated cell death. Recently, molecular studies have revealed genes involved in response to UV exposure, with respect to programmed cell death (PCD). PMID:23344059

Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

International Nuclear Information System (INIS)

Jinnai, Butsurin; Fukuda, Seiichi; Ohtake, Hiroto; Samukawa, Seiji

2010-01-01

UV radiation during plasma processing affects the surface of materials. Nevertheless, the interaction of UV photons with surface is not clearly understood because of the difficulty in monitoring photons during plasma processing. For this purpose, we have previously proposed an on-wafer monitoring technique for UV photons. For this study, using the combination of this on-wafer monitoring technique and a neural network, we established a relationship between the data obtained from the on-wafer monitoring technique and UV spectra. Also, we obtained absolute intensities of UV radiation by calibrating arbitrary units of UV intensity with a 126 nm excimer lamp. As a result, UV spectra and their absolute intensities could be predicted with the on-wafer monitoring. Furthermore, we developed a prediction system with the on-wafer monitoring technique to simulate UV-radiation damage in dielectric films during plasma etching. UV-induced damage in SiOC films was predicted in this study. Our prediction results of damage in SiOC films shows that UV spectra and their absolute intensities are the key cause of damage in SiOC films. In addition, UV-radiation damage in SiOC films strongly depends on the geometry of the etching structure. The on-wafer monitoring technique should be useful in understanding the interaction of UV radiation with surface and in optimizing plasma processing by controlling UV radiation.

Effect of coupled UV-A and UV-C LEDs on both microbiological and chemical pollution of urban wastewaters

Energy Technology Data Exchange (ETDEWEB)

Chevremont, A.-C., E-mail: anne-celine.chevremont@imbe.fr [Aix-Marseille Universite - CNRS, FR ECCOREV, Laboratoire Chimie de l' Environnement (FRE3416), Equipe ' Developpements Metrologiques et Chimie des Milieux' , 3 place Victor Hugo, case 29, 13331 Marseille Cedex 3 (France); Aix-Marseille Universite - CNRS, FR ECCOREV, Institut Mediterraneen de Biodiversite et d' Ecologie marine et continentale (UMR7263), Equipe ' Vulnerabilite des Systemes Microbiens' , Avenue Escadrille Normandie-Niemen, Boite 452, 13397 Marseille Cedex 20 (France); Farnet, A.-M. [Aix-Marseille Universite - CNRS, FR ECCOREV, Institut Mediterraneen de Biodiversite et d' Ecologie marine et continentale (UMR7263), Equipe ' Vulnerabilite des Systemes Microbiens' , Avenue Escadrille Normandie-Niemen, Boite 452, 13397 Marseille Cedex 20 (France); Coulomb, B.; Boudenne, J.-L. [Aix-Marseille Universite - CNRS, FR ECCOREV, Laboratoire Chimie de l' Environnement (FRE3416), Equipe ' Developpements Metrologiques et Chimie des Milieux' , 3 place Victor Hugo, case 29, 13331 Marseille Cedex 3 (France)

2012-06-01

Wastewater reuse for irrigation is an interesting alternative for many Mediterranean countries suffering from water shortages. The development of new technologies for water recycling is a priority for these countries. In this study we test the efficiency of UV-LEDs (Ultraviolet-Light-Emitting Diodes) emitting UV-A or UV-C radiations, used alone or coupled, on bacterial and chemical indicators. We monitored the survival of fecal bioindicators found in urban wastewaters and the oxidation of creatinine and phenol which represent either conventional organic matter or the aromatic part of pollution respectively. It appears that coupling UV-A/UV-C i) achieves microbial reduction in wastewater more efficiently than when a UV-LED is used alone, and ii) oxidizes up to 37% of creatinine and phenol, a result comparable to that commonly obtained with photoreactants such as TiO{sub 2}. - Highlights: Black-Right-Pointing-Pointer We test UV-LEDs as an urban wastewater tertiary treatment. Black-Right-Pointing-Pointer UV-A and UV-C are coupled, combining germicidal and oxidative properties of UV. Black-Right-Pointing-Pointer Coupled wavelengths have the most efficient bactericidal effect. Black-Right-Pointing-Pointer Coupling UV-A and UV-C leads to photooxidation of creatinine and phenol.

Efficacy of hand held, inexpensive UV light sources on Acanthamoeba, causative organism in amoebic keratitis

Directory of Open Access Journals (Sweden)

Ivan Cometa

2010-01-01

Full Text Available Ivan Cometa1, Andrew Rogerson1, Scott Schatz21Department of Biology, California State University Fresno, Fresno, CA, USA; 2Arizona College of Optometry, Midwestern University, Glendale, AZ, USAAbstract: Multipurpose lens cleaning solutions (MPS fail to consistently kill or inactivate Acanthamoeba cysts and UV irradiation, while effective at high doses, can damage contact lenses. The present study considered synergy of action between MPS and hand-held inexpensive (ie, relatively weak UV irradiation units. Regardless of disinfection method recently formed cysts (<10 days were far more susceptible to treatment than mature cysts (>14 days. This has important implications for future protocols on testing methods for killing amoebae. The study also showed that cysts of different strains (two tested, FLA2 and P120 are variable in their response to MPS, presumably reflecting differences in cyst wall structure and thus permeability to the disinfectant. On the other hand, the effect of UV irradiation was not wall structure dependent. A 6-hour treatment with MPS alone killed trophic amoebae but failed to kill any mature cysts. Cysts of strain FLA2 were killed after 24 hours with MPS but cysts of strain P120 survived. UV irradiation with the larger 4 W unit killed all cysts after 7 minutes and was more effective than the smaller battery-powered unit (after 10 minutes about 50% of cysts were killed. When the larger unit was used with the MPS disinfection, all trophozoites were killed using UV for 3 minutes and MPS for 1 hour. The resistant P120 cysts remained a challenge but a 2- to 4-minute UV treatment followed by MPS for 3 or 6 hours reduced mature cyst survival by about 50%. The small unit in combination with MPS was less effective but did reduce the time required to kill trophic amoebae in MPS (6 hours MPS alone versus 3 hours MPS with a 1-minute UV treatment. In short, inexpensive UV units do enhance MPS disinfection and future lens cleaning systems

UV-blocking spectacle lens protects against UV-induced decline of visual performance.

Science.gov (United States)

Liou, Jyh-Cheng; Teng, Mei-Ching; Tsai, Yun-Shan; Lin, En-Chieh; Chen, Bo-Yie

2015-01-01

Excessive exposure to sunlight may be a risk factor for ocular diseases and reduced visual performance. This study was designed to examine the ability of an ultraviolet (UV)-blocking spectacle lens to prevent visual acuity decline and ocular surface disorders in a mouse model of UVB-induced photokeratitis. Mice were divided into 4 groups (10 mice per group): (1) a blank control group (no exposure to UV radiation), (2) a UVB/no lens group (mice exposed to UVB rays, but without lens protection), (3) a UVB/UV400 group (mice exposed to UVB rays and protected using the CR-39™ spectacle lens [UV400 coating]), and (4) a UVB/photochromic group (mice exposed to UVB rays and protected using the CR-39™ spectacle lens [photochromic coating]). We investigated UVB-induced changes in visual acuity and in corneal smoothness, opacity, and lissamine green staining. We also evaluated the correlation between visual acuity decline and changes to the corneal surface parameters. Tissue sections were prepared and stained immunohistochemically to evaluate the structural integrity of the cornea and conjunctiva. In blank controls, the cornea remained undamaged, whereas in UVB-exposed mice, the corneal surface was disrupted; this disruption significantly correlated with a concomitant decline in visual acuity. Both the UVB/UV400 and UVB/photochromic groups had sharper visual acuity and a healthier corneal surface than the UVB/no lens group. Eyes in both protected groups also showed better corneal and conjunctival structural integrity than unprotected eyes. Furthermore, there were fewer apoptotic cells and less polymorphonuclear leukocyte infiltration in corneas protected by the spectacle lenses. The model established herein reliably determines the protective effect of UV-blocking ophthalmic biomaterials, because the in vivo protection against UV-induced ocular damage and visual acuity decline was easily defined.

Ecological responses to UV radiation: interactions between the biological effects of UV on plants and on associated organisms.

Science.gov (United States)

Paul, Nigel D; Moore, Jason P; McPherson, Martin; Lambourne, Cathryn; Croft, Patricia; Heaton, Joanna C; Wargent, Jason J

2012-08-01

Solar ultraviolet (UV)-B radiation (280-315 nm) has a wide range of effects on terrestrial ecosystems, yet our understanding of how UV-B influences the complex interactions of plants with pest, pathogen and related microorganisms remains limited. Here, we report the results of a series of experiments in Lactuca sativa which aimed to characterize not only key plant responses to UV radiation in a field environment but also consequential effects for plant interactions with a sap-feeding insect, two model plant pathogens and phylloplane microorganism populations. Three spectrally modifying filters with contrasting UV transmissions were used to filter ambient sunlight, and when compared with our UV-inclusive filter, L. sativa plants grown in a zero UV-B environment showed significantly increased shoot fresh weight, reduced foliar pigment concentrations and suppressed population growth of green peach aphid (Myzus persicae). Plants grown under a filter which allowed partial transmission of UV-A radiation and negligible UV-B transmission showed increased density of leaf surface phylloplane microbes compared with the UV-inclusive treatment. Effects of UV treatment on the severity of two plant pathogens, Bremia lactucae and Botrytis cinerea, were complex as both the UV-inclusive and zero UV-B filters reduced the severity of pathogen persistence. These results are discussed with reference to known spectral responses of plants, insects and microorganisms, and contrasted with established fundamental responses of plants and other organisms to solar UV radiation, with particular emphasis on the need for future integration between different experimental approaches when investigating the effects of solar UV radiation. Copyright © Physiologia Plantarum 2011.

Study of mechanical behavior of PMMA in bending and after UV irradiation and gamma radiation; Estudo do comportamento mecanico do PMMA sob flexao apos irradiacao UV e gama

Energy Technology Data Exchange (ETDEWEB)

Todt, M.L.; Kienen, V.D.; Azevedo, E.C., E-mail: helunica@yahoo.com.br [Universidade Tecnologica Federal do Parana (UTFPR), Curitiba, PR (Brazil)

2014-07-01

PMMA is a polymer that has density similar to water and refractive index alike to glass. It has been used in the substitution to roofing tiles and coverages, affording to be exposed to UV radiation and gamma radiation. This paper had the objective to study the effect in the flexural proprieties of the PMMA exposed to these types of radiations and the evaluation of the wettability through a contact angle measurer. The PMMA specimens have been submitted to 1500 h of UVA radiation, 1500 h of UVC radiation and to 25kGy of gamma radiation. The results show that the PMMA. (author)

Monitoring and control of UV and UV-TiO{sub 2} disinfections for municipal wastewater reclamation using artificial neural networks

Energy Technology Data Exchange (ETDEWEB)

Lin, Chuang-Hung [Department of Architecture, National United University, Miao-Li 360, Taiwan, ROC (China); Yu, Ruey-Fang, E-mail: rfyu@nuu.edu.tw [Department of Safety, Health and Environmental Engineering, National United University, Miao-Li 360, Taiwan, ROC (China); Cheng, Wen-Po; Liu, Chun-Ru [Department of Safety, Health and Environmental Engineering, National United University, Miao-Li 360, Taiwan, ROC (China)

2012-03-30

Highlights: Black-Right-Pointing-Pointer ANN models can effectively control both UV and UV-TiO{sub 2} disinfections for wastewater reuse. Black-Right-Pointing-Pointer Comparing to UV disinfection, UV-TiO{sub 2} disinfection can save 13.2-15.7% of UV dosage and capacity. Black-Right-Pointing-Pointer SS decreases disinfection efficiency when UV doses were <10,000 {mu}W s/cm{sup 2}. - Abstract: The use of ultraviolet (UV) irradiation as a physical wastewater disinfection has increased in recent years, especially for wastewater reuse. The UV-TiO{sub 2} can generate OH radicals, which is highly effective to inactivate microorganisms in wastewater disinfection. However, both UV and UV-TiO{sub 2} disinfections create multiple physical, chemical, and bio-chemical phenomena that affect their germicidal efficiency. It is difficult to build a precise control model using existing mathematic models. This study applies artificial neural network (ANN) models to control UV and UV-TiO{sub 2} disinfections. Experimental results indicate that the ANN models, which precisely generate relationships among multiple monitored parameters, total coliform counts in influent and effluent, and UV doses, can be used as control models for UV and UV-TiO{sub 2} disinfections. A novel ANN control strategy is applied to control UV and UV-TiO{sub 2} disinfection processes to meet three total coliform count limits for three wastewater reuse purposes. The proposed controlled strategy effectively controls UV and UV-TiO{sub 2} disinfection, resulting in acceptable total coliform counts in effluent for the three wastewater reuse purposes. The required UV doses for UV-TiO{sub 2} disinfection were lower than those for UV disinfection, resulting in energy saving and capacity reduction of 13.2-15.7%.

Health hazards of UV radiation

International Nuclear Information System (INIS)

Matthes, R.

1994-01-01

The author describes the effects and health risks of UV exposure. This includes UV effects on the DNS, the eyes, the immune system, and the skin. Finally, recommendations are given for protection against excessive UV exposure on the basis of the IRPA/INIRC guidelines. (orig.) [de

Deep UV LEDs

Science.gov (United States)

Han, Jung; Amano, Hiroshi; Schowalter, Leo

2014-06-01

article by Jiang et al on using BN for UV devices; potentially as a p-type wide band gap semiconductor contact. Finally, an in-depth discussion of one DUV application in defense, the non-line-of-sight (NLOS) communication, is given by Drost and Sadler. Overall, we believe that this special issue of Semiconductor Science and Technology provides a useful overview of the state-of-art in the field on DUV materials and devices. In view of the rapidly growing interest in this field, the demonstrated enhanced device performance, and the wide range of applications, this special issue can be considered a very timely contribution. Finally, we would like to thank the IOP editorial staff, in particular Alice Malhador, for their support and also like to thank all contributors for their efforts to make this special issue possible.

Transmission of UV-irradiance into nectarine fruit

International Nuclear Information System (INIS)

Blanke, M.M.

1996-01-01

With the global depletion of the ozone layer, leaves and fruits are increasingly exposed to UV-irradiance on the tree. Some fruits are additionally exposed postharvest to artificial germicidal W-irradiance, leading to a cumulative effect. This paper examines the transmission of UV-light (200-400 nm) by the peel of ripe nectarine fruit using UV/VIS spectrophotometry to aid understanding of UV-effects and assess the sensitivity of the peel to UV wavelengths. Yellow peel of nectarine fruit transmitted less than 0.1 % in the UV-C range of 220 to 280 nm. With longer wavelenghts, UV-light transmission increased slowly from 0.4 % at 284 nm to 1.6 % at 320 nm and, in the UV-A region, progressively from 1.9 % at 330 nm to a maximum of 13 % of incident irradiance at 400 nm. Red peel of nectarine fruit transmitted less than 0.1 % of UV-C and UV-B light, but up to 0.9 % of incident UV-A light at 400 nm. Conversely, UV-absorption of nectarine peel decreased with longer wavelengths. Hence, fruit parenchyma is more affected by UV-irradiance at wavelengths above ca. 280 nm and underneath yellow than underneath red peel

Impact of polymer film thickness and cavity size on polymer flow during embossing : towards process design rules for nanoimprint lithography.

Energy Technology Data Exchange (ETDEWEB)

Schunk, Peter Randall; King, William P. (Georgia Institute of Technology, Atlanta, GA); Sun, Amy Cha-Tien; Rowland, Harry D. (Georgia Institute of Technology, Atlanta, GA)

2006-08-01

This paper presents continuum simulations of polymer flow during nanoimprint lithography (NIL). The simulations capture the underlying physics of polymer flow from the nanometer to millimeter length scale and examine geometry and thermophysical process quantities affecting cavity filling. Variations in embossing tool geometry and polymer film thickness during viscous flow distinguish different flow driving mechanisms. Three parameters can predict polymer deformation mode: cavity width to polymer thickness ratio, polymer supply ratio, and Capillary number. The ratio of cavity width to initial polymer film thickness determines vertically or laterally dominant deformation. The ratio of indenter width to residual film thickness measures polymer supply beneath the indenter which determines Stokes or squeeze flow. The local geometry ratios can predict a fill time based on laminar flow between plates, Stokes flow, or squeeze flow. Characteristic NIL capillary number based on geometry-dependent fill time distinguishes between capillary or viscous driven flows. The three parameters predict filling modes observed in published studies of NIL deformation over nanometer to millimeter length scales. The work seeks to establish process design rules for NIL and to provide tools for the rational design of NIL master templates, resist polymers, and process parameters.

Delayed expression of enhanced reactivation and decreased mutagenesis of UV-irradiated adenovirus in UV-irradiated ataxia telangiectasia fibroblasts

International Nuclear Information System (INIS)

Bennett, C.B.; Rainbow, A.J.

1988-01-01

In this study the authors examined UV-enhanced reactivation (UVER) and UV-enhanced mutagenesis (UVEM) of UV-irradiated adenovirus in AT fibroblasts. UVER factors for Ad V antigen expression were significantly less than normal in AT strains tested when infection occurred immediately after UV-irradiation of cells. However, UVER factors were >1 and similar to those found for normal strains when cells were infected 24 h after UV-irradiation, indicating delay in the expression of UVER for Ad V antigen in AT cells. UV-irradiation of both normal and AT cells 24 h prior to infection also resulted in a significant increase in progeny survival for UV-irradiated Ad. In normal cells, this progeny UVER was concomitant with a significant increase in the mutation frequency for UV-irradiated virus (increase in targeted mutagenesis) suggesting existence of an inducible error-prone DNA repair mode in normal human cells. In contrast, pre-UV-irradiation of AT cells resulted in a significant decrease in the mutation frequency for UV-irradiated virus. (author)

Effect of UV irradiation on the early development of silkworm embryos, (2). Development of irradiated eggs

Energy Technology Data Exchange (ETDEWEB)

Kobayashi, Y. (Hokkaido Univ., Sapporo (Japan). Faculty of Agriculture)

1981-02-01

The development of silkworm eggs irradiated with UV was compared with that of normal eggs. When the eggs were irradiated with UV from the lateral side immediately after oviposition, development was decelerated, but the germ band was produced. The side of the germ band that was irradiated with UV was abnormal with holes, but the opposite side was hole-free and normal. The normal half of the germ band splits longitudinally, but developed along with the abnormal half to form various malformations. When the eggs were irradiated from the ventral side, the ventral part of the germ band was abnormal at the early stage, the germ band did not concentrate to one place, and produced the half-embryos longitudinally divided by the median line. The UV irradiation at the beginning of the blastoderm stage produced similar results. In the areas irradiated by UV, cleavage nuclei invaded into the surrounding protoplasm, and mitotic figures were observed, but the cell number did not increase even with the advance of development unlike normal cells, whereas the sizes of the cells, their nuclei and nucleoli were enlarged, and intercellular space widened so that the cells were no longer in close contact. The germ band cells produced in the non-irradiated area were normal. The above results suggest that when either the protoplasm or the nucleus of a silkworm egg is damaged by UV, the effect first appears as the inhibition of cell division in the germ band, and as the enlargement of the cell, nucleus and nucleoli. It is presumed that this induces the subsequent inhibition of cell differentiation or abnormalities.

Effect of uvs1, uvs2 and xrs mutations on the radiosensitivity and the induced mitotic recombination frequency in diploid yeast cells

International Nuclear Information System (INIS)

Suslova, N.G.; Fedorova, I.V.; Zheleznyakova, N.Yu.

1975-01-01

The influence of the loci of radiosensitivity uvs1, uvs2, and xrs in the homozygous state at the diploid level on the sensitivity to UV and ionizing radiation and induced mitotic recombination was studied in the yeast Sacch. cerevisiae. Hypersensitivity to UV irradiation was detected in the diploids uvs2 uvs2 xrs xrs in comparision with the corresponding control. The diploid uvs1 uvs1 uvs2 uvs2 does not differ in UV sensitivity from the diploid uvs1 uvs1 UVS2 UVS2. These facts demonstrate that the uvs1 and uvs2 mutations, on the one hand, and the xrs mutations, on the other, normally control different pathways of elimination of UV-induced damages. It was shown that the diploid uvs2 uvs2 xrs3 xrs3 is far more sensitive to the lethal action of x rays than the control diploid UVS2 UVS2 xrs3 xrs3. Consequently, the mutations uvs2 and xrs3 block different modes of repair of damages induced by ionizing radiation. In all the double-mutant diploids, the frequency of mitotic recombination induced by UV rays increases sharply in comparison with that of the radioresistant diploids UVS UVS XRS XRS and the UV-sensitive diploids uvs2 uvs2 XRS XRS. Possible causes of the observed phenomenon are discussed. It was established that in a diploid homozygous for the loci uvs2 xrs5, the frequency of mitotic recombination induced by x rays increases extremely sharply. This fact confirms the hypothesis that the gene product of the locus uvs2 participates in the repair of DNA after the action of ionizing radiation. (author)

UV-LED Curing Efficiency of Wood Coatings

Directory of Open Access Journals (Sweden)

Véronic Landry

2015-12-01

Full Text Available Ultraviolet light emitting diodes (UV-LEDs have attracted great interest in recent years. They can be used to polymerize coatings, such as those used for prefinished wood flooring. In this project, two lamps were compared for their suitability to be used on a wood flooring finishing line: a UV-microwave and a UV-LED lamp. Low heat emission was found for the UV-LED lamp compared to the UV-microwave one. This study also reveals that the 4 W/cm2 UV-LED lamp used is not powerful enough to cure UV high solids acrylate coatings while satisfactory results can be obtained for UV water-based formulations. In fact, conversion percentages were found to be low for the high solids coatings, leaving the coatings tacky. Higher conversion percentages were obtained for the UV water-based formulations. As a result, mass loss, hardness, and scratch resistance found for the samples cured by UV-LED were closed to the ones found for the samples cured using the UV microwave lamp.

Effect of far-UV and near-UV radiation on the cell surface charge of the protozoan Tritrichomonas foetus

Energy Technology Data Exchange (ETDEWEB)

Silva Filho, F C; Elias, C A; Souza, W de

1986-05-01

Cell electrophoresis was used to detect the effect of far-UV or near-UV radiation on the cell surface charge of the pathogenic protozoan Tritrichomonas foetus. Either far-UV or near-UV radiation interfered with the surface charge of T. foetus at fluences which inhibited cell growth by 50%. Both UV-radiations induced a significant decrease on surface charge of T. foetus, as evaluated by measurement of its electrophoretic mobility (EPM). Determinations of EPM of protozoa in solution of low ionic strength indicated that the decrease in the EPM induced by far-UV is much less pronounced that that observed for near-UV or control cells.

Effect of far-UV and near-UV radiation on the cell surface charge of the protozoan Tritrichomonas foetus

International Nuclear Information System (INIS)

Silva Filho, F.C.; Elias, C.A.; Souza, W. de

1986-01-01

Cell electrophoresis was used to detect the effect of far-UV or near-UV radiation on the cell surface charge of the pathogenic protozoan Tritrichomonas foetus. Either far-UV or near-UV radiation interfered with the surface charge of T. foetus at fluences which inhibited cell growth by 50%. Both UV-radiations induced a significant decrease on surface charge of T. foetus, as evaluated by measurement of its electrophoretic mobility (EPM). Determinations of EPM of protozoa in solution of low ionic strength indicated that the decrease in the EPM induced by far-UV is much less pronounced that that observed for near-UV or control cells. (author)

Efficiency increase in flexible bulk heterojunction solar cells with a nano-patterned indium zinc oxide anode

Energy Technology Data Exchange (ETDEWEB)

Wang, Dong Hwan; Seifter, Jason; Heeger, Alan J. [Center for Polymers and Organic Solids, University of California at Santa Barbara, Santa Barbara, California 93106-5090 (United States); Park, Jong Hyeok [School of Chemical Engineering and SAINT, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Choi, Dae-Geun [Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon, 305-343 (Korea, Republic of)

2012-11-15

Efficient flexible bulk-heterojunction polymer solar cells based on PCDTBT/PC{sub 70}BM were successfully fabricated by a simple nano-imprint technique. The flexible nano-patterned IZO anode with ordered periodic dot structures led to improved light absorption and increased interfacial contact area between the anode and polymer as well as between the polymer and cathode. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

In-vivo data on the influence of tobacco smoke and UV light on murine skin.

Science.gov (United States)

Pavlou, P; Rallis, M; Deliconstantinos, G; Papaioannou, G; Grando, S A

2009-01-01

Inhaled tobacco smoke comes in direct contact with few organs such as mouth, lungs, and stomach. Cigarette smoke (CS) in lungs has been extensively studied. However, limited data exist on its effect on skin, and there are no long-term experimental studies suggesting toxic effects on skin. Even though it is generally accepted that CS is among the main factors of skin aging, the number of experimental studies showing this aging effect is limited. We hereby studied the effect of long-term exposure to CS on the skin of hairless mice in combination with or without ultraviolet (UV) light. In addition, we investigated potential skin protection by a potent antioxidant namely procyanidine-rich French maritime pine bark extract (PBE) pycnogenol. Male and female hairless SKH-2 mice were exposed for 10 months to tobacco smoke and/or UV light in vivo, and their effects on skin were investigated. Some biophysical parameters such as development of erythema, transepidermal water loss (TEWL), and skin elasticity were measured. The results show that UV and CS may be acting synergistically, as shown by the enhanced TEWL, erythema values, epitheliomas, and squamous cell carcinomas (SCCs) observed, whereas PBE seems to protect skin against SCC.

[Light protection: principles of UV protection].

Science.gov (United States)

Stege, H; Mang, R

2006-05-01

UV radiation is responsible for the induction of epithelial and melanocytic skin cancer, photoaging, and photodermatoses. UV protection is necessary to prevent damage caused by non-physiologic exposure. UV protection includes not only reduction of sun exposure but also use of sun protective filters, UV protective clothes, DNA repair enzymes, and antioxidant supplementation. Consumers are uncertain about the possibilities and limitations of commercial sun protection measures. Dermatologists must explain protective measures to the general public which continues to believe that UV-tanned skin is healthy. The sunscreen market is a highly competitive but lucrative market. The range of products with different designations and promises makes difficult for both consumers and dermatologists to determine what is sensible UV protection.

UV survival of human mycoplasmas

International Nuclear Information System (INIS)

Aoki, Shigeji; Ito, Shoko; Watanabe, Takehiko

1979-01-01

The inactivation by ultraviolet (UV) light irradiation of mycoplasma cells of five human strains was monitored by investigating the colony-forming ability. The survival curves of five strains tested indicated that the cells of Mycoplasma buccale only are single and homogenously susceptible to UV light. The effect of the repair inhibitor, caffeine, on the colony-forming ability of UV-irradiated cells was investigated with M. buccale because of its homogeneous susceptibility to UV light. The colony formation of irradiated cells was markedly depressed by post-irradiation treatment with caffeine at concentration that had little or no effect on the colony formation of unirradiated cells. The colony-forming units (CFU) of UV-irradiated cells which were kept in broth without caffeine in the dark increased without a lag as the time in the dark increased. The colony-forming ability of the irradiated cells completely recovered after 3 hr in the dark. However, when irradiated cells were kept in the presence of caffeine, no increase in their CFU was observed. The mode of action of caffeine on UV-irradiated cells closely resembles that described for other organisms which possess dark reactivation systems for UV-induced damage in deoxyribonucleic acid. Thus, the results obtained provide evidence for the existence of a dark repair function in M. buccale. (author)

Polycyclic aromatic hydrocarbons (PAHs) skin permeation rates change with simultaneous exposures to solar ultraviolet radiation (UV-S).

Science.gov (United States)

Hopf, Nancy B; Spring, Philipp; Hirt-Burri, Nathalie; Jimenez, Silvia; Sutter, Benjamin; Vernez, David; Berthet, Aurelie

2018-05-01

Road construction workers are simultaneously exposed to two carcinogens; solar ultraviolet (UV-S) radiation and polycyclic aromatic hydrocarbons (PAHs) in bitumen emissions. The combined exposure may lead to photogenotoxicity and enhanced PAH skin permeation rates. Skin permeation rates (J) for selected PAHs in a mixture (PAH-mix) or in bitumen fume condensate (BFC) with and without UV-S co-exposures were measured with in vitro flow-through diffusion cells mounted with human viable skin and results compared. Possible biomarkers were explored. Js were greater with UV-S for naphthalene, anthracene, and pyrene in BFC (0.08-0.1 ng/cm 2 /h) compared to without (0.02-0.26 ng/cm 2 /h). This was true for anthracene, pyrene, and chrysene in the PAH-mix. Naphthalene and benzo(a)pyrene (BaP) in the PAH-mix had greater Js without (0.97-13.01 ng/cm 2 /h) compared to with UV-S (0.40-6.35 ng/cm 2 /h). Time until permeation (T lags ) in the PAH-mix were generally shorter compared to the BFC, and they ranged from 1 to 13 h. The vehicle matrix could potentially be the reason for this discrepancy as BFC contains additional not identified substances. Qualitative interpretation of p53 suggested a dose-response with UV-S, and somewhat with the co-exposures. MMP1, p65 and cKIT were not exploitable. Although not statistically different, PAHs permeate human viable skin faster with simultaneous exposures to UV. Copyright © 2018 Elsevier B.V. All rights reserved.

Ultraviolet radiation exposure from UV-transilluminators.

Science.gov (United States)

Akbar-Khanzadeh, Farhang; Jahangir-Blourchian, Mahdi

2005-10-01

UV-transilluminators use ultraviolet radiation (UVR) to visualize proteins, DNA, RNA, and their precursors in a gel electrophoresis procedure. This study was initiated to evaluate workers' exposure to UVR during their use of UV-transilluminators. The levels of irradiance of UV-A, UV-B, and UV-C were determined for 29 UV-transilluminators at arbitrary measuring locations of 6, 25, 62, and 125 cm from the center of the UV-transilluminator's filter surface in the direction of the operator's head. The operators (faculty, research staff, and graduate students) worked within 62 cm of the transilluminators, with most subjects commonly working at time ranged from 1 to 60 min. Actinic hazard (effective irradiance level of UVR) was also determined for three representative UV-transilluminators at arbitrary measuring locations of 2.5, 5, 10, 15, 20, 30, 40, and 50 cm from these sets' filter surface in the direction of the operator's head. The allowable exposure time for these instruments was less than 20 sec within 15 cm, less than 35 sec within 25 cm, and less than 2 min within 50 cm from the UV-transilluminators' filter surface. The results of this study suggest that the use of UV-transilluminators exposes operators to levels of UVR in excess of exposure guidelines. It is recommended that special safety training be provided for the affected employees and that exposure should be controlled by one or the combination of automation, substitution, isolation, posted warning signs, shielding, and/or personal protective equipment.

Occupational contact urticaria and protein contact dermatitis.

Science.gov (United States)

Doutre, Marie-Sylvie

2005-01-01

Irritant dermatitis and eczema are the most prevalent occupational skin diseases. Less common are immediate contact reactions such as contact urticaria and protein contact dermatitis. Occupational contact urticaria can be subdivided into two categories, immunological and non immunological. However, some agents can induce these two types of reactions. Contact urticaria to natural rubber latex is particularly frequent among health care personnel, but contact urticaria to a wide variety of other substances occurs in many other occupations. Among those at risk are cooks, bakers, butchers, restaurant personnel, veterinarians, hairdressers, florists, gardeners, and forestry workers. Protein contact dermatitis in some of these occupations is caused principally by proteins of animal or plant origin, especially among individuals with a history of atopic dermatitis. Diagnosis requires careful interrogation, clinical examination and skin tests (open tests and prick tests with immediate lecture) to identify a particular contact allergen.

Photodegradation and toxicity changes of antibiotics in UV and UV/H{sub 2}O{sub 2} process

Energy Technology Data Exchange (ETDEWEB)

Fang, Yuan [State Key Laboratory of Environmental Aquatic Chemistry, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing, 100085 (China); Hu Chun, E-mail: huchun@rcees.ac.cn [State Key Laboratory of Environmental Aquatic Chemistry, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing, 100085 (China); Xuexiang, Hu; Dongbin, Wei; Yong, Chen; Jiuhui, Qu [State Key Laboratory of Environmental Aquatic Chemistry, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing, 100085 (China)

2011-01-30

The photodegradation of three antibiotics, oxytetracycline (OTC), doxycycline (DTC), and ciprofloxacin (CIP) in UV and UV/H{sub 2}O{sub 2} process was investigated with a low-pressure UV lamp system. Experiments were performed in buffered ultrapure water (UW), local surface water (SW), and treated water from local municipal drinking water treatment plant (DW) and wastewater treatment plant (WW). The efficiency of UV/H{sub 2}O{sub 2} process was affected by water quality. For all of the three selected antibiotics, the fastest degradation was observed in DW, and the slowest degradation occurred in WW. This phenomenon can be explained by R{sub OH,UV}, defined as the experimentally determined {center_dot}OH radical exposure per UV fluence. The R{sub OH,UV} values represent the background {center_dot}OH radical scavenging in water matrix, obtained by the degradation of para-chlorobenzoic acid (pCBA), a probe compound. In natural water, the indirect degradation of CIP did not significantly increase with the addition of H{sub 2}O{sub 2} due to its effective degradation by UV direct photolysis. Moreover, the formation of several photoproducts and oxidation products of antibiotics in UV/H{sub 2}O{sub 2} process was identified using GC-MS. Toxicity assessed by Vibrio fischer (V. fischer), was increased in UV photolysis, for the photoproducts still preserving the characteristic structure of the parent compounds. While in UV/H{sub 2}O{sub 2} process, toxicity increased first, and then decreased; nontoxic products were formed by the oxidation of {center_dot}OH radical. In this process, detoxification was much easier than mineralization for the tested antibiotics, and the optimal time for the degradation of pollutants in UV/H{sub 2}O{sub 2} process would be determined by parent compound degradation and toxicity changes.

Photodegradation of sulfasalazine and its human metabolites in water by UV and UV/peroxydisulfate processes.

Science.gov (United States)

Ji, Yuefei; Yang, Yan; Zhou, Lei; Wang, Lu; Lu, Junhe; Ferronato, Corinne; Chovelon, Jean-Marc

2018-04-15

The widespread occurrence of pharmaceuticals and their metabolites in natural waters has raised great concerns about their potential risks on human health and ecological systems. This study systematically investigates the degradation of sulfasalazine (SSZ) and its two human metabolites, sulfapyridine (SPD) and 5-aminosalicylic acid (5-ASA), by UV and UV/peroxydisulfate (UV/PDS) processes. Experimental results show that SPD and 5-ASA were readily degraded upon UV 254 nm direct photolysis, with quantum yields measured to be (8.6 ± 0.8) × 10 -3 and (2.4 ± 0.1) × 10 -2  mol Einstein -1 , respectively. Although SSZ was resistant to direct UV photolysis, it could be effectively removed by both UV/H 2 O 2 and UV/PDS processes, with fluence-based pseudo-first-order rate constants determined to be 0.0030 and 0.0038 cm 2  mJ -1 , respectively. Second-order rate constant between SO 4 •- and SSZ was measured as (1.33 ± 0.01) × 10 9  M -1 s -1 by competition kinetic method. A kinetic model was established for predicting the degradation rate of SSZ in the UV/PDS process. Increasing the dosage of PDS significantly enhanced the degradation of SSZ in the UV/PDS process, which can be well predicted by the developed kinetic model. Natural water constituents, such as natural organic matter (NOM) and bicarbonate (HCO 3 - ), influenced the degradation of SSZ differently. The azo functional group of SSZ molecule was predicted as the reactive site susceptible to electrophilic attack by SO 4 •- by frontier electron densities (FEDs) calculations. Four intermediate products arising from azo bond cleavage and SO 2 extrusion were identified by solid phase extraction-liquid chromatography-triple quadrupole mass spectrometry (SPE-LC-MS/MS). Based on the products identified, detailed transformation pathways for SSZ degradation in the UV/PDS system were proposed. Results reveal that UV/PDS could be an efficient approach for remediation of water

Cerium oxide nanoparticles, combining antioxidant and UV shielding properties, prevent UV-induced cell damage and mutagenesis

Science.gov (United States)

Caputo, Fanny; de Nicola, Milena; Sienkiewicz, Andrzej; Giovanetti, Anna; Bejarano, Ignacio; Licoccia, Silvia; Traversa, Enrico; Ghibelli, Lina

2015-09-01

Efficient inorganic UV shields, mostly based on refracting TiO2 particles, have dramatically changed the sun exposure habits. Unfortunately, health concerns have emerged from the pro-oxidant photocatalytic effect of UV-irradiated TiO2, which mediates toxic effects on cells. Therefore, improvements in cosmetic solar shield technology are a strong priority. CeO2 nanoparticles are not only UV refractors but also potent biological antioxidants due to the surface 3+/4+ valency switch, which confers anti-inflammatory, anti-ageing and therapeutic properties. Herein, UV irradiation protocols were set up, allowing selective study of the extra-shielding effects of CeO2vs. TiO2 nanoparticles on reporter cells. TiO2 irradiated with UV (especially UVA) exerted strong photocatalytic effects, superimposing their pro-oxidant, cell-damaging and mutagenic action when induced by UV, thereby worsening the UV toxicity. On the contrary, irradiated CeO2 nanoparticles, via their Ce3+/Ce4+ redox couple, exerted impressive protection on UV-treated cells, by buffering oxidation, preserving viability and proliferation, reducing DNA damage and accelerating repair; strikingly, they almost eliminated mutagenesis, thus acting as an important tool to prevent skin cancer. Interestingly, CeO2 nanoparticles also protect cells from the damage induced by irradiated TiO2, suggesting that these two particles may also complement their effects in solar lotions. CeO2 nanoparticles, which intrinsically couple UV shielding with biological and genetic protection, appear to be ideal candidates for next-generation sun shields.

Ground testing and flight demonstration of charge management of insulated test masses using UV-LED electron photoemission

International Nuclear Information System (INIS)

Saraf, Shailendhar; Buchman, Sasha; Balakrishnan, Karthik; Lui, Chin Yang; Alfauwaz, Abdulrahman; DeBra, Daniel; Soulage, Michael; Faied, Dohy; Hanson, John; Ling, Kuok; Jaroux, Belgacem; Suwaidan, Badr Al; AlRashed, Abdullah; Al-Nassban, Badr; Alaqeel, Faisal; Harbi, Mohammed Al; Salamah, Badr Bin; Othman, Mohammed Bin; Qasim, Bandar Bin; Al-Majed, Mohammed

2016-01-01

The UV-LED mission demonstrates the precise control of the potential of electrically isolated test masses. Test mass charge control is essential for the operation of space accelerometers and drag-free sensors which are at the core of geodesy, aeronomy and precision navigation missions as well as gravitational wave experiments and observatories. Charge management using photoelectrons generated by the 254 nm UV line of Hg was first demonstrated on Gravity Probe B and is presently part of the LISA Pathfinder technology demonstration. The UV-LED mission and prior ground testing demonstrates that AlGaN UVLEDs operating at 255 nm are superior to Hg lamps because of their smaller size, lower power draw, higher dynamic range, and higher control authority. We show laboratory data demonstrating the effectiveness and survivability of the UV-LED devices and performance of the charge management system. We also show flight data from a small satellite experiment that was one of the payloads on KACST’s SaudiSat-4 mission that demonstrates ‘AC charge control’ (UV-LEDs and bias are AC modulated with adjustable relative phase) between a spherical test mass and its housing. The result of the mission brings the UV-LED device Technology Readiness Level (TRL) to TRL-9 and the charge management system to TRL-7. We demonstrate the ability to control the test mass potential on an 89 mm diameter spherical test mass over a 20 mm gap in a drag-free system configuration, with potential measured using an ultra-high impedance contact probe. Finally, the key electrical and optical characteristics of the UV-LEDs showed less than 7.5% change in performance after 12 months in orbit. (paper)

Semi-conservative synthesis of DNA in UV-sensitive mutant cells of Chinese hamster after UV-irradiation

International Nuclear Information System (INIS)

Vikhanskaya, F.L.; Khrebtukova, I.A.; Manuilova, E.S.

1985-01-01

A study was made of the rate of semi-conservative DNA synthesis in asynchronous UV-resistant (clone V79) and UV-sensitive clones (VII and XII) of Chinese hamster cells after UV-irradiation. In all 3 clones studied, UV-irradiation (5-30 J/m 2 ) induced a decrease in the rate of DNA synthesis during the subsequent 1-2 h. In the resistant clone (V79) recovery of DNA synthesis rate started after the first 2 h post-irradiation (5 J/m 2 ) and by the 3rd hour reached its maximum value, which constituted 70% of that observed in control, non-irradiated cells. The UV-sensitive mutant clones VII and XII showed no recovery in the rate of DNA synthesis during 6-7 h post-irradiation. The results obtained show that the survival of cells is correlated with the ability of DNA synthesis to recover after UV-irradiation in 3 clones studied. The observed recovery of UV-inhibited DNA synthesis in mutant clones may be due to certain defects in DNA repair. (orig.)

Sulfonation of polyester fabrics by gaseous sulfur oxide activated by UV irradiation

International Nuclear Information System (INIS)

Kordoghli, Bessem; Khiari, Ramzi; Mhenni, Mohamed Farouk; Sakli, Faouzi; Belgacem, Mohamed Naceur

2012-01-01

Highlights: ► In this paper, an original technique was present to improve the hydrophilic properties of polyester fibres. ► The modification of PET fabric was carried out using gaseous sulfur trioxide activated by UV irradiations. ► We fully characterized the modified and untreated fabrics. - Abstract: This paper describes an original technique aiming to improve the hydrophilic properties of polyester fibres. In this method, the sulfonation of the aromatic rings is carried out using gaseous sulfur trioxide activated by UV irradiations. Thus, exposing the polyester textile fabric to the UVC light (wavelength around 254 nm) under a stream of sulfur trioxide leads to the fixation of -SO 3 H groups. The amounts of the fixed sulfonate groups depended on the reaction conditions. Evidence of grafting deduced from the measurements of hygroscopic properties was carried out by contact angle measurement, moisture regain as well as by measuring the rate of retention. SEM and FT-IR analysis, DSC and DTA/TGA thermograms showed that no significant modifications have occurred in the bulk of the treated PET fabrics.

Conformation of L-Tyrosine Studied by Fluorescence-Detected UV-UV and IR-UV Double-Resonance Spectroscopy

OpenAIRE

Inokuchi, Yoshiya; Kobayashi, Yusuke; Ito, Takafumi; Ebata, Takayuki

2007-01-01

The laser-induced fluorescence spectrum of jet-cooled L-tyrosine exhibits more than 20 vibronic bands in the 35450-35750 cm-1 region. We attribute these bands to eight conformers by using results of UV-UV hole-burning spectroscopy. These isomers are classified into four groups; each group consists of two rotational isomers that have a similar side-chain conformation but different orientations of the phenolic OH. The splitting of band origins of rotational isomers is 31, 21, 5, and 0 cm-1 for ...

Low-Cost and Rapid Fabrication of Metallic Nanostructures for Sensitive Biosensors Using Hot-Embossing and Dielectric-Heating Nanoimprint Methods

Directory of Open Access Journals (Sweden)

Kuang-Li Lee

2017-07-01

Full Text Available We propose two approaches—hot-embossing and dielectric-heating nanoimprinting methods—for low-cost and rapid fabrication of periodic nanostructures. Each nanofabrication process for the imprinted plastic nanostructures is completed within several seconds without the use of release agents and epoxy. Low-cost, large-area, and highly sensitive aluminum nanostructures on A4 size plastic films are fabricated by evaporating aluminum film on hot-embossing nanostructures. The narrowest bandwidth of the Fano resonance is only 2.7 nm in the visible light region. The periodic aluminum nanostructure achieves a figure of merit of 150, and an intensity sensitivity of 29,345%/RIU (refractive index unit. The rapid fabrication is also achieved by using radio-frequency (RF sensitive plastic films and a commercial RF welding machine. The dielectric-heating, using RF power, takes advantage of the rapid heating/cooling process and lower electric power consumption. The fabricated capped aluminum nanoslit array has a 5 nm Fano linewidth and 490.46 nm/RIU wavelength sensitivity. The biosensing capabilities of the metallic nanostructures are further verified by measuring antigen–antibody interactions using bovine serum albumin (BSA and anti-BSA. These rapid and high-throughput fabrication methods can benefit low-cost, highly sensitive biosensors and other sensing applications.

Efficiency of ocular UV protection by clear lenses.

Science.gov (United States)

Rifai, Katharina; Hornauer, Matthias; Buechinger, Ramona; Schoen, Roland; Barraza-Bernal, Maria; Habtegiorgis, Selam; Glasenapp, Carsten; Wahl, Siegfried; Mappes, Timo

2018-04-01

Ocular UV doses accumulate all-day, not only during periods of direct sun exposure. The UV protection efficiency of three clear lenses was evaluated experimentally, validated by simulation, and compared to non-UV protection: a first spectacle lens with a tailored UV absorber, a second spectacle lens, minimizing UV back reflections, as well as a third spectacle lens, combining both. A tailored UV-absorber efficiently reduced overall UV irradiance to 7 %, whereas reduction of back-reflections still left UV irradiance at 42 %. Thus, clear lenses with a tailored UV absorber efficiently protect the eye from UV, supplementing sun glasses wear to an all-day protection scenario.

Fabrication of Monolithic Bridge Structures by Vacuum-Assisted Capillary-Force Lithography

KAUST Repository

Kwak, Rhokyun

2009-04-06

Monolithic bridge structures were fabricated by using capillary-force lithography (CFL), which was developed for patterning polymers over a large area by combining essential features of nanoimprint lithography and capillarity. A patterned soft mold was placed on a spin-coated UV-curable resin on a substrate. The polymer then moved into the cavity of the mold by capillary action and then solidified after exposure to UV radiation. The uncured resin was forced to migrate into the cavity of a micropatterned PDMS mold by capillarity, and then exposed to UV radiation under a high-energy mercury lamp with intensity. A rotary pump was then turned on, decreasing the air pressure in the chamber. SEM images were taken with a high-resolution SEM at an acceleration voltage greater than 15 kV. It was observed that when the air pressure was rapidly reduced to a low vacuum, the top layer moved into the nanochannels with a meniscus at the interface between the nanoscale PUA and the base structure.

Combined "dual" absorption and fluorescence smartphone spectrometers.

Science.gov (United States)

Arafat Hossain, Md; Canning, John; Ast, Sandra; Cook, Kevin; Rutledge, Peter J; Jamalipour, Abbas

2015-04-15

A combined "dual" absorption and fluorescence smartphone spectrometer is demonstrated. The optical sources used in the system are the white flash LED of the smartphone and an orthogonally positioned and interchangeable UV (λex=370  nm) and blue (λex=450  nm) LED. The dispersive element is a low-cost, nano-imprinted diffraction grating coated with Au. Detection over a 300 nm span with 0.42 nm/pixel resolution was carried out with the camera CMOS chip. By integrating the blue and UV excitation sources into the white LED circuitry, the entire system is self-contained within a 3D printed case and powered from the smartphone battery; the design can be scaled to add further excitation sources. Using a customized app, acquisition of absorption and fluorescence spectra are demonstrated using a blue-absorbing and green-emitting pH-sensitive amino-naphthalimide-based fluorescent probe and a UV-absorbing and blue-emitting Zn2+-sensitive fluoro-ionophore.

Exposure to solar UV in Finland

Energy Technology Data Exchange (ETDEWEB)

Jokela, K; Leszczynski, K; Visuri, R; Ylianttila, L [Finnish Centre for Radiation and Nuclear Safety, Helsinki (Finland)

1996-12-31

Exceptionally low total ozone, up to 40 % below the normal level, was measured over Northern Europe during winter and spring in 1992 and 1993. In 1993 the depletion persisted up to the end of May, resulting in a significant increase in biologically effective ultraviolet (UV) radiation. The increases were significantly smaller in 1992 and 1994 than in 1993. A special interest in Northern Europe is the effect of high reflection of UV from the snow. The period from the mid March to the mid May is critical in Northern Finland, because in that time the UV radiation is intense enough to cause significant biological effects, and the UV enhancing snow still covers the ground. Moreover, there is some evidence of increasing springtime depletions of ozone over Arctic regions. In this study the increase of UV exposure associated with the ozone depletions was examined with measurements and theoretical calculations. The measurements were carried out with spectroradiometrically calibrated Solar Light Model 500 and 501 UV radiometers which measure the erythemally effective UV doses and dose rates. The theoretical UV doses and dose rates were computed with the clear sky model of Green

Exposure to solar UV in Finland

Energy Technology Data Exchange (ETDEWEB)

Jokela, K.; Leszczynski, K.; Visuri, R.; Ylianttila, L. [Finnish Centre for Radiation and Nuclear Safety, Helsinki (Finland)

1995-12-31

Exceptionally low total ozone, up to 40 % below the normal level, was measured over Northern Europe during winter and spring in 1992 and 1993. In 1993 the depletion persisted up to the end of May, resulting in a significant increase in biologically effective ultraviolet (UV) radiation. The increases were significantly smaller in 1992 and 1994 than in 1993. A special interest in Northern Europe is the effect of high reflection of UV from the snow. The period from the mid March to the mid May is critical in Northern Finland, because in that time the UV radiation is intense enough to cause significant biological effects, and the UV enhancing snow still covers the ground. Moreover, there is some evidence of increasing springtime depletions of ozone over Arctic regions. In this study the increase of UV exposure associated with the ozone depletions was examined with measurements and theoretical calculations. The measurements were carried out with spectroradiometrically calibrated Solar Light Model 500 and 501 UV radiometers which measure the erythemally effective UV doses and dose rates. The theoretical UV doses and dose rates were computed with the clear sky model of Green

UV inactivation: Combined effects of UV radiation and xenobiotics in two strains of Saccharomyces

International Nuclear Information System (INIS)

Lochmann, E.R.; Lochmann, G.

1997-01-01

The effects of eight chemicals on the inactivation rate of ultraviolet radiation on the colony building capabilities of two strains of Saccharomyces cervisae - a wild type strain and a mutant deficient in excision repair - were studied. The insecticide methoxychlor, the herbicide 2,4-dichlorophenoxyacetic acid, the fungicide pentachlorophenol and its metabolite tetrachlorohydroquinone, as well as the chemicals acrylonitrile and 2,3-dichloro-1-propene have no significant impact on the effects of UV radiation in Saccharomyces cerevisae. Depending on the concentration, trichloroethylene increases the sensitivity to UV radiation. The herbicide paraquat provides efficient protection against UV radiation at concentrations where a toxic effect cannot be observed even without UV. The results were rather similar for both strains. (orig.) [de

UV DISINFECTION GUIDANCE MANUAL FOR THE ...

Science.gov (United States)

Provides technical information on selection, design and operation of UV systems; provides regulatory agencies with guidance and the necessary tools to assess UV systems at the design, start-up, and routine operation phase; provides manufacturers with the testing and performance standards for UV components and systems for treating drinking water. Provide guidance to water systems, regulators and manufacturers on UV disinfection of drinking water.

Is UV-A radiation a cause of malignant melanoma. Er UV-A aarsak til malignt melanom

Energy Technology Data Exchange (ETDEWEB)

Moan, J. (Det Norske Radiumhospital, Oslo (Norway))

1994-03-01

The first action spectrum for cutaneous malignant melanoma was published recently. This spectrum was obtained using the fish Xiphophorus. If the same action spectrum applies to humans, the following statements are true: Sunbathing products (agents to protect against the sun) that absorb UV-B radiation provide almost no protection against cutaneous malignant melanoma. UV-A-solaria are more dangerous than expected so far. If people are determined to use artificial sources of radiation for tanning, they should choose UV-B solaria rather than UV-A-solaria. Fluorescent tubes and halogen lamps may have weak melanomagenic effects. Ozone depletion has almost no effect on the incidence rates of CMM, since ozone absorbs very little UV-A radiation. Sunbathing products which contain UV-A-absorbing compounds or neutral filter (like titanium oxide) provide real protection against cutaneous malignant melanoma, at least if they are photochemically inert. 34 refs., 2 figs.

HAZMAT. I. The evolution of far-UV and near-UV emission from early M stars

International Nuclear Information System (INIS)

Shkolnik, Evgenya L.; Barman, Travis S.

2014-01-01

The spectral energy distribution, variability, and evolution of the high-energy radiation from an M dwarf planet host is crucial in understanding the planet's atmospheric evolution and habitability and in interpreting the planet's spectrum. The star's extreme-UV (EUV), far-UV (FUV), and near-UV (NUV) emission can chemically modify, ionize, and erode the atmosphere over time. This makes determining the lifetime exposure of such planets to stellar UV radiation critical for both the evolution of a planet's atmosphere and our potential to characterize it. Using the early M star members of nearby young moving groups, which sample critical ages in planet formation and evolution, we measure the evolution of the GALEX NUV and FUV flux as a function of age. The median UV flux remains at a 'saturated' level for a few hundred million years, analogous to that observed for X-ray emission. By the age of the Hyades Cluster (650 Myr), we measure a drop in UV flux by a factor of 2-3 followed by a steep drop from old (several Gyrs) field stars. This decline in activity beyond 300 Myr follows roughly t –1 . Despite this clear evolution, there remains a wide range, of 1-2 orders of magnitude, in observed emission levels at every age. These UV data supply the much-needed constraints to M dwarf upper-atmosphere models, which will provide empirically motivated EUV predictions and more accurate age-dependent UV spectra as inputs to planetary photochemical models.

HAZMAT. I. The evolution of far-UV and near-UV emission from early M stars

Energy Technology Data Exchange (ETDEWEB)

Shkolnik, Evgenya L. [Lowell Observatory, 1400 West Mars Hill Road, Flagstaff, AZ 86001 (United States); Barman, Travis S., E-mail: shkolnik@lowell.edu, E-mail: barman@lpl.arizona.edu [Department of Planetary Sciences and Lunar and Planetary Laboratory, University of Arizona, Tucson, AZ 85721 (United States)

2014-10-01

The spectral energy distribution, variability, and evolution of the high-energy radiation from an M dwarf planet host is crucial in understanding the planet's atmospheric evolution and habitability and in interpreting the planet's spectrum. The star's extreme-UV (EUV), far-UV (FUV), and near-UV (NUV) emission can chemically modify, ionize, and erode the atmosphere over time. This makes determining the lifetime exposure of such planets to stellar UV radiation critical for both the evolution of a planet's atmosphere and our potential to characterize it. Using the early M star members of nearby young moving groups, which sample critical ages in planet formation and evolution, we measure the evolution of the GALEX NUV and FUV flux as a function of age. The median UV flux remains at a 'saturated' level for a few hundred million years, analogous to that observed for X-ray emission. By the age of the Hyades Cluster (650 Myr), we measure a drop in UV flux by a factor of 2-3 followed by a steep drop from old (several Gyrs) field stars. This decline in activity beyond 300 Myr follows roughly t {sup –1}. Despite this clear evolution, there remains a wide range, of 1-2 orders of magnitude, in observed emission levels at every age. These UV data supply the much-needed constraints to M dwarf upper-atmosphere models, which will provide empirically motivated EUV predictions and more accurate age-dependent UV spectra as inputs to planetary photochemical models.

Inhibitory effects of ambient levels of solar UV-A and UV-B radiation in growth of cv. New Red Fire lettuce

International Nuclear Information System (INIS)

Krizek, D.T.; Britz, S.J.; Mirecki, R.M.

1998-01-01

The influence of solar UV-A and UV-B radiation at Beltsville, MD, USA, on growth of Lactuca sativa L. (cv. New Red Fire lettuce) was examined during early summer of 1996 and 1997. Plants were grown from seed in plastic window boxes covered with Llumar to exclude UV-A and UV-B, polyester to exclude UV-B, or tefzel (1996) or teflon (1997) to transmit UV-A and UV-B radiation. After 31-34 days, plants grown in the absence of solar UV-B radiation (polyester) had 63 and 57% greater fresh weight and dry weight of tops, respectively, and 57, 72 and 47% greater dry weight of leaves, stems and roots, respectively, as compared to those grown under ambient UV-B (tefzel or teflon). Plants protected from UV-A radiation as well (Llumar) showed an additional 43 and 35% increase, respectively, in fresh and dry weight of tops and a 33 and 33% increase, respectively, in dry weight of leaves and stems, but no difference in root biomass over those grown under polyester. Excluding ambient UV-B (polyester) significantly reduced the UV absorbance of leaf extracts at 270, 300 and 330 nm (presumptive flavonoids) and the concentration of anthocyantins at 550 nm as compared to those of leaf extract from plants grown under ambient UV-A and UV-B. Additional removal of ambient UV-A (Llumar) reduced the concentration of anthocyanins, but had no further effect on UV absorbance at 270, 300 or 330 nm. These findings provide evidence that UV-B radiation is more important than UV-A radiation for flavonoid induction in this red-pigmented lettuce cultivar. Although previous workers have obtained decreases in lettuce yield under enhanced UV-B, this is the first evidence for inhibitory effects of solar UV-A and UV-B radiation on lettuce growth. (au)

Inhibitory effects of ambient levels of solar UV-A and UV-B radiation in growth of cv. New Red Fire lettuce

Energy Technology Data Exchange (ETDEWEB)

Krizek, D.T.; Britz, S.J.; Mirecki, R.M. [Climate Stress Laboratory, Beltsville, MD (United States)

1998-05-01

The influence of solar UV-A and UV-B radiation at Beltsville, MD, USA, on growth of Lactuca sativa L. (cv. New Red Fire lettuce) was examined during early summer of 1996 and 1997. Plants were grown from seed in plastic window boxes covered with Llumar to exclude UV-A and UV-B, polyester to exclude UV-B, or tefzel (1996) or teflon (1997) to transmit UV-A and UV-B radiation. After 31-34 days, plants grown in the absence of solar UV-B radiation (polyester) had 63 and 57% greater fresh weight and dry weight of tops, respectively, and 57, 72 and 47% greater dry weight of leaves, stems and roots, respectively, as compared to those grown under ambient UV-B (tefzel or teflon). Plants protected from UV-A radiation as well (Llumar) showed an additional 43 and 35% increase, respectively, in fresh and dry weight of tops and a 33 and 33% increase, respectively, in dry weight of leaves and stems, but no difference in root biomass over those grown under polyester. Excluding ambient UV-B (polyester) significantly reduced the UV absorbance of leaf extracts at 270, 300 and 330 nm (presumptive flavonoids) and the concentration of anthocyantins at 550 nm as compared to those of leaf extract from plants grown under ambient UV-A and UV-B. Additional removal of ambient UV-A (Llumar) reduced the concentration of anthocyanins, but had no further effect on UV absorbance at 270, 300 or 330 nm. These findings provide evidence that UV-B radiation is more important than UV-A radiation for flavonoid induction in this red-pigmented lettuce cultivar. Although previous workers have obtained decreases in lettuce yield under enhanced UV-B, this is the first evidence for inhibitory effects of solar UV-A and UV-B radiation on lettuce growth. (au) 34 refs.

Transverse effects in UV FELs

International Nuclear Information System (INIS)

Small, D.W.; Wong, R.K.; Colson, W.B.

1995-01-01

In an ultraviolet Free Electron Laser (UV FEL), the electron beam size can be approximately the same as the optical mode size. The performance of a UV FEL is studied including the effect of emittance, betatron focusing, and external focusing of the electron beam on the transverse optical mode. The results are applied to the Industrial Laser Consortium's UV FEL

UV Fluorescence Photography of Works of Art : Replacing the Traditional UV Cut Filters with Interference Filters

Directory of Open Access Journals (Sweden)

Luís BRAVO PEREIRA

2010-09-01

Full Text Available For many years filters like the Kodak Wratten E series, or the equivalent Schneider B+W 415, were used as standard UV cut filters, necessary to obtain good quality on UV Fluorescence photography. The only problem with the use of these filters is that, when they receive the UV radiation that they should remove, they present themselves an internal fluorescence as side effect, that usually reduce contrast and quality on the final image. This article presents the results of our experiences on using some innovative filters, that appeared available on the market in recent years, projected to adsorb UV radiation even more efficiently than with the mentioned above pigment based standard filters: the interference filters for UV rejection (and, usually, for IR rejection too manufactured using interference layers, that present better results than the pigment based filters. The only problem with interference filters type is that they are sensitive to the rays direction and, because of that, they are not adequate to wide-angle lenses. The internal fluorescence for three filters: the B+W 415 UV cut (equivalent to the Kodak Wratten 2E, pigment based, the B+W 486 UV IR cut (an interference type filter, used frequently on digital cameras to remove IR or UV and the Baader UVIR rejection filter (two versions of this interference filter were used had been tested and compared. The final quality of the UV fluorescence images seems to be of a superior quality when compared to the images obtained with classic filters.

Cerium oxide nanoparticles, combining antioxidant and UV shielding properties, prevent UV-induced cell damage and mutagenesis

KAUST Repository

Caputo, Fanny

2015-08-20

Efficient inorganic UV shields, mostly based on refracting TiO2 particles, have dramatically changed the sun exposure habits. Unfortunately, health concerns have emerged from the pro-oxidant photocatalytic effect of UV-irradiated TiO2, which mediates toxic effects on cells. Therefore, improvements in cosmetic solar shield technology are a strong priority. CeO2 nanoparticles are not only UV refractors but also potent biological antioxidants due to the surface 3+/4+ valency switch, which confers anti-inflammatory, anti-ageing and therapeutic properties. Herein, UV irradiation protocols were set up, allowing selective study of the extra-shielding effects of CeO2vs. TiO2 nanoparticles on reporter cells. TiO2 irradiated with UV (especially UVA) exerted strong photocatalytic effects, superimposing their pro-oxidant, cell-damaging and mutagenic action when induced by UV, thereby worsening the UV toxicity. On the contrary, irradiated CeO2 nanoparticles, via their Ce3+/Ce4+ redox couple, exerted impressive protection on UV-treated cells, by buffering oxidation, preserving viability and proliferation, reducing DNA damage and accelerating repair; strikingly, they almost eliminated mutagenesis, thus acting as an important tool to prevent skin cancer. Interestingly, CeO2 nanoparticles also protect cells from the damage induced by irradiated TiO2, suggesting that these two particles may also complement their effects in solar lotions. CeO2 nanoparticles, which intrinsically couple UV shielding with biological and genetic protection, appear to be ideal candidates for next-generation sun shields. © The Royal Society of Chemistry 2015.

Hybrid 2D patterning using UV laser direct writing and aerosol jet printing of UV curable polydimethylsiloxane

Science.gov (United States)

Obata, Kotaro; Schonewille, Adam; Slobin, Shayna; Hohnholz, Arndt; Unger, Claudia; Koch, Jürgen; Suttmann, Oliver; Overmeyer, Ludger

2017-09-01

The hybrid technique of aerosol jet printing and ultraviolet (UV) laser direct writing was developed for 2D patterning of thin film UV curable polydimethylsiloxane (PDMS). A dual atomizer module in an aerosol jet printing system generated aerosol jet streams from material components of the UV curable PDMS individually and enables the mixing in a controlled ratio. Precise control of the aerosol jet printing achieved the layer thickness of UV curable PDMS as thin as 1.6 μm. This aerosol jet printing system is advantageous because of its ability to print uniform thin-film coatings of UV curable PDMS on planar surfaces as well as free-form surfaces without the use of solvents. In addition, the hybrid 2D patterning using the combination of UV laser direct writing and aerosol jet printing achieved selective photo-initiated polymerization of the UV curable PDMS layer with an X-Y resolution of 17.5 μm.

Sun, UV Radiation and Your Eyes

Science.gov (United States)

... Sunglasses Sun Smart UV Safety Infographic The Sun, UV Radiation and Your Eyes Leer en Español: El ... Aug. 28, 2014 Keep an Eye on Ultraviolet (UV) Safety Eye medical doctors (ophthalmologists) caution us that ...

UV Photography Shows Hidden Sun Damage

Science.gov (United States)

... mcat1=de12", ]; for (var c = 0; c UV photography shows hidden sun damage A UV photograph gives ... developing skin cancer and prematurely aged skin. Normal photography UV photography 18 months of age: This boy's ...

The Aspergillus uvsH gene encodes a product homologous to yeast RAD18 and Neurospora UVS-2.

Science.gov (United States)

Yoon, J H; Lee, B J; Kang, H S

1995-07-28

The uvsH DNA repair gene of Aspergillus nidulans has been cloned by complementation of the uvsH77 mutation with a cosmid library containing genomic DNA inserts from a wild-type strain. Methylmethane sulfonate (MMS)-resistant transformants were obtained on medium containing 0.01% MMS, to which uvsH mutants exhibit high sensitivity. Retransformation of uvsH77 mutants with the rescued cosmids from the MMS-resistant transformants resulted in restoration of both UV and MMS resistance to wild-type levels. Nucleotide sequence analysis of the genomic DNA and cDNA of the uvsH gene shows that it has an open reading frame (ORF) of 1329 bp, interrupted by two introns of 51 and 61 bp. A 2.4 kb transcript of the uvsH gene was detected by Northern blot analysis. Primer extension analysis revealed that transcription starts at 31 bp upstream from the translation initiation codon. This gene encodes a predicted polypeptide of 443 amino acids, which has two unique zinc finger motifs. The proposed polypeptide displays 39% identity to the Neurospora crassa UVS-2 protein and 24% identity to the Saccharomyces cerevisiae RAD18 protein. The sequence similarity is particularly high in three domains. One zinc finger (RING finger) motif is located in the first domain close to the N-terminus. The other zinc finger motif is in the second domain. In the third domain, the mutation sites in both the uvsH77 and uvsH304 alleles were identified.(ABSTRACT TRUNCATED AT 250 WORDS)

UV-LED Curing Efficiency of Wood Coatings

OpenAIRE

Véronic Landry; Pierre Blanchet; Gabrielle Boivin; Jean-François Bouffard; Mirela Vlad

2015-01-01

Ultraviolet light emitting diodes (UV-LEDs) have attracted great interest in recent years. They can be used to polymerize coatings, such as those used for prefinished wood flooring. In this project, two lamps were compared for their suitability to be used on a wood flooring finishing line: a UV-microwave and a UV-LED lamp. Low heat emission was found for the UV-LED lamp compared to the UV-microwave one. This study also reveals that the 4 W/cm2 UV-LED lamp used is not powerf...

Development and future of ultraviolet light-emitting diodes: UV-LED will replace the UV lamp

Science.gov (United States)

Muramoto, Yoshihiko; Kimura, Masahiro; Nouda, Suguru

2014-06-01

Ultraviolet light-emitting diodes (UV-LEDs) have started replacing UV lamps. The power per LED of high-power LED products has reached 12 W (14 A), which is 100 times the values observed ten years ago. In addition, the cost of these high-power LEDs has been decreasing. In this study, we attempt to understand the technologies and potential of UV-LEDs.

Evaluating the effects of UV-B and UV-A irradiances on plant pigments, photosynthesis and growth in Glycine max L

International Nuclear Information System (INIS)

Middleton, E.H.M.

1993-01-01

Increasing penetration of UV-B radiation to the earth's surface resulting from stratospheric ozone depletion is an important environmental concern, but plant response to UV-B irradiation has been difficult to assess. The UV-A irradiance has not been specifically measured or controlled previously. The experimental UV-A was controlled in a series of three glasshouse experiments conducted under high photosynthetic photon flux (midday PPF ≥ 1200 μmol m -2 s -1 ). Low (LT) and High (HT) daily UV-B BE irradiances (10.7; 14.1 kJ m -2 ) were utilized in two experiments, whereas treatments with different UV-B BE :UV-A ratios ( BE :UV-A ratios

Photocatalytic mineralization of codeine by UV-A/TiO{sub 2}—Kinetics, intermediates, and pathways

Energy Technology Data Exchange (ETDEWEB)

Kuo, Chin-Sheng [Graduate Institute of Environmental Engineering, National Taiwan University, Taipei 106, Taiwan, ROC (China); Lin, Cheng-Fang, E-mail: cflin@ntu.edu.tw [Graduate Institute of Environmental Engineering, National Taiwan University, Taipei 106, Taiwan, ROC (China); Hong, Pui-Kwan Andy [Department of Civil and Environmental Engineering, University of Utah, Salt Lake City, UT 84112 (United States)

2016-01-15

Highlights: • Codeine was completely removed in 30 min under irradiated UV-A/TiO{sub 2}. • Codeine was mineralized in 90 min with near complete N conversion to NH{sub 4}{sup +} and NO{sub 3}{sup −}. • Morphine was authenticated and four others were identified as intermediates. • Degradation proceeded via ipso-substitution and hydroxylation of the aromatic ring. - Abstract: This study investigated the photocatalytic degradation of codeine by UV-irradiated TiO{sub 2}. The degradation kinetics was determined under varied conditions including the TiO{sub 2} loading, codeine concentration, and pH. Codeine and several reaction intermediates including morphine were identified and tracked during degradation using HPLC/MS–MS technique, along with TOC and IC measurements. Specifically, removal of 100 μg/L of spike codeine was complete in 3 min by contact with a 0.1 g/L suspension of TiO{sub 2} under UV irradiation at pH 7. The degradation kinetics of codeine was first-order with respect to both the catalyst TiO{sub 2} and the reactant codeine, with enhanced reaction rates with increasing pH up to pH 9. Mineralization of codeine was possible upon prolonged contact; near complete mineralization of 10 mg/L of codeine was achieved in 90 min with 0.1 g/L TiO{sub 2} under irradiation at pH 5, during which the organic nitrogen was converted to NH{sub 3}-N (74%) and NO{sub 3}-N (22%). Based on the identified intermediates, two degradation pathways were proposed of which one involved ipso-substitution followed by cleavage of the aromatic ring and another involved repeated hydroxylation of the codeine molecule followed by its fragmentation.

Effects of UV radiation on freshwater metazooplankton

International Nuclear Information System (INIS)

Tartarotti, B.

1999-06-01

There is evidence that fluxes of solar ultraviolet-B radiation (UV-B, 290-320 nm) are increasing over wide parts of the earth's surface due to stratospheric ozone depletion. UV radiation (290-400 nm) can have damaging effects on biomolecules and cell components that are common to most living organisms. The aim of this thesis is to gain a more thorough understanding of the potential impacts of solar radiation on freshwater metazooplankton. To detect UV-vulnerability in zooplankton populations dominating the zooplankton community of two clear-water, high mountain lakes located one in the Austrian Alps and another in the Chilean Andes, the survival of two copepod species was studied. The organisms were exposed to a 10- to 100-fold increase in UV-B radiation compared to those levels found at their natural, maximum daytime distribution. Both species vertically migrate and are pigmented. UV-absorbing compounds with a maximum absorption at ∼334 nm were also detected. Cyclops abyssorum tatricus, a common cyclopoid copepod species of Alpine lakes, was highly resistant to UV-B radiation and no significant lethal effect was observed. The calanoid copepod Boeckella gracilipes, frequent in Andean lakes, had a mortality ∼5 times higher in the treatment receiving full sunlight than in the UV-B excluded treatment (3.2 %) only when exposed for 70 h. The resistance of B. gracilipes was higher than that reported in the literature for the same species suggesting the existence of intraspecific differences in UV sensitivity. Survival, fecundity and development of the zooplankton community of a clear-water, high elevation Andean lake (33 o S) were studied with mesocosms experiments after prolonged UV exposure (48 days). When exposed to full sunlight, the population of the cladoceran Chydorus sphaericus and the rotifer Lepadella ovalis were strongly inhibited by UV-B, whereas both species were resistant to UV-A radiation. Conversely, UV-B radiation had no effect on the survival of the

High Power UV LED Industrial Curing Systems

Energy Technology Data Exchange (ETDEWEB)

Karlicek, Robert, F., Jr; Sargent, Robert

2012-05-14

UV curing is a green technology that is largely underutilized because UV radiation sources like Hg Lamps are unreliable and difficult to use. High Power UV LEDs are now efficient enough to replace Hg Lamps, and offer significantly improved performance relative to Hg Lamps. In this study, a modular, scalable high power UV LED curing system was designed and tested, performing well in industrial coating evaluations. In order to achieve mechanical form factors similar to commercial Hg Lamp systems, a new patent pending design was employed enabling high irradiance at long working distances. While high power UV LEDs are currently only available at longer UVA wavelengths, rapid progress on UVC LEDs and the development of new formulations designed specifically for use with UV LED sources will converge to drive more rapid adoption of UV curing technology. An assessment of the environmental impact of replacing Hg Lamp systems with UV LED systems was performed. Since UV curing is used in only a small portion of the industrial printing, painting and coating markets, the ease of use of UV LED systems should increase the use of UV curing technology. Even a small penetration of the significant number of industrial applications still using oven curing and drying will lead to significant reductions in energy consumption and reductions in the emission of green house gases and solvent emissions.

UV disinfection of water

International Nuclear Information System (INIS)

Skipperud, E.; Johansen; Myhrstad, J.A.

1978-01-01

UV radiation has been found to have advantages over chloration for the disinfection of water. New regulations for dietary conditions on Norwegian ships introduced in 1974 led to increased use of UV disinfection, and this has in the following years spread to waterworks. The present article is based on a study to determine possible limitation. The nature of the injuries to the microorganisms is first discussed, together with repair mechanisms. A table is given showing the energy required for 90 and 100 percent inactivation of a number of microorganisms. Some other factors affecting UV inactivation are briefly mentioned. (JIW)

In vivo activation of human immunodeficiency virus type 1 long terminal repeat by UV type A (UV-A) light plus psoralen and UV-B light in the skin of transgenic mice

OpenAIRE

Morrey, John D; Bourn, S M; Bunch, T D; Jackson, M K; Sidwell, R W; Barrows, L R; Daynes, R A; Rosen, C A

1991-01-01

UV irradiation has been shown to activate the human immunodeficiency virus type 1 (HIV-1) long terminal repeat (LTR) in cell culture; however, only limited studies have been described in vivo. UV light has been categorized as UV-A (400 to 315 nm), -B (315 to 280 nm), or -C (less than 280 nm); the longer wavelengths are less harmful but more penetrative. Highly penetrative UV-A radiation constitutes the vast majority of UV sunlight reaching the earth's surface but is normally harmless. UV-B ir...

UV-A enhanced growth and UV-B induced positive effects in the recovery of photochemical yield in Gracilaria lemaneiformis (Rhodophyta).

Science.gov (United States)

Xu, Juntian; Gao, Kunshan

2010-09-02

The effects of solar UV radiation (280-400 nm) on growth, quantum yield and pigmentation in Gracilaria lemaneiformis were investigated when the thalli were cultured under solar radiation with or without UV for a period of 15 days. Presence of UV-A (315-400 nm) enhanced the relative growth rate, while UV-B (218-315 nm) inhibited it. The positive effect of UV-A and negative effect of UV-B counteracted to result in an insignificant impact of UVR on growth. During the noon period, both UV-A and UV-B resulted in the decrease of maximum quantum yield (Fv/Fm), but UV-B aided in the recovery of the yield in the late afternoon, reflecting that UV-B might be used as a signal in photorepair processes. UV induced the accumulation of UV-absorbing compounds (UVAC) to defend against the harmful UVR. However, the accumulation of UVAC took a much longer time compared to that previously reported, which was probably due to the lower levels of solar radiation and water temperature in the early spring period. Unknown UV-absorbing compounds (UVAC), which peaked at 265 nm, probably the precursor of MAAs (UVAC(325)), accumulated under moderate levels of solar radiation and were transformed to MAAs under higher solar radiation. Copyright (c) 2010 Elsevier B.V. All rights reserved.

Development and future of ultraviolet light-emitting diodes: UV-LED will replace the UV lamp

International Nuclear Information System (INIS)

Muramoto, Yoshihiko; Kimura, Masahiro; Nouda, Suguru

2014-01-01

Ultraviolet light-emitting diodes (UV-LEDs) have started replacing UV lamps. The power per LED of high-power LED products has reached 12 W (14 A), which is 100 times the values observed ten years ago. In addition, the cost of these high-power LEDs has been decreasing. In this study, we attempt to understand the technologies and potential of UV-LEDs. (invited article)

Significant role of UV and carbonate radical on the degradation of oxytetracycline in UV-AOPs: Kinetics and mechanism.

Science.gov (United States)

Liu, Yiqing; He, Xuexiang; Duan, Xiaodi; Fu, Yongsheng; Fatta-Kassinos, Despo; Dionysiou, Dionysios D

2016-05-15

Carbonate radical (CO3(•-)), a selective oxidant, reacts readily with electron-rich compounds through electron transfer and/or hydrogen abstraction. In this study, the role of CO3(•-) in degrading oxytetracycline (OTC) by UV only, UV/H2O2 and UV/persulfate (UV/PS) advanced oxidation processes (AOPs) in the presence of HCO3(-) or CO3(2-) was investigated. For UV only process, the presence of photosensitizers, i.e., nitrate (NO3(-)) and natural organic matter (NOM), had different impacts on OTC degradation, i.e., an enhancing effect by NO3(-) due to the generation of HO(•) and a slight inhibiting effect by NOM possibly due to a light scattering effect. Differently for UV/H2O2 and UV/PS processes, the presence of NO3(-) hardly influenced the destruction of OTC. Generation of CO3(•-) presented a positive role on OTC degradation by UV/NO3(-)/HCO3(-). Such influence was also observed in the two studied AOPs in the presence of both bicarbonate and other natural water constituents. When various natural water samples from different sources were used as reaction matrices, UV only and UV/H2O2 showed an inhibiting effect while UV/PS demonstrated a comparable or even promoting effect in OTC decomposition. After elucidating the potential contribution of UV direct photolysis via excited state OTC* at an elevated reaction pH condition, putative OTC transformation byproducts via CO3(•-) reaction were identified by ultra-high definition accurate-mass quadrupole time-of-flight tandem mass spectrometry (QTOF/MS). Five different reaction pathways were subsequently proposed, including hydroxylation (+16 Da), quinonization (+14 Da), demethylation (-14 Da), decarbonylation (-28 Da) and dehydration (-18 Da). The significant role of UV at high pH and CO3(•-) on OTC removal from contaminated water was therefore demonstrated both kinetically and mechanistically. Copyright © 2016 Elsevier Ltd. All rights reserved.

UV-straling in de kas: mogelijkheden en grenzen

NARCIS (Netherlands)

Hoffmann, S.

2000-01-01

Effect van UV-straling op kleuring van Coleus Blumei 'Wizzard Velvit Red'. Gegevens in bijgaande tabellen: 1) Indeling optische straling; 2) Transmisse voor UV-straling van verschillende dekmaterialen (folie UV, glas UV, glas normaal, folie normaal, folie UV-blok

Superhydrophobic durable coating based on UV-photoreactive silica nanoparticles

Energy Technology Data Exchange (ETDEWEB)

Nahum, T.; Dodiuk, H.; Dotan, A.; Kenig, S. [Department of Plastics Engineering, Shenkar College of Engineering and Design, 12 Anna Frank Street, Ramat Gan 52526 (Israel); Lellouche, J. P. [Department of Chemistry, Nanomaterials Research Center, Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramar-Gan, 52900 (Israel)

2015-05-22

Superhydrophobic surfaces with contact angle (CA) >150 and sliding angle (SA) <10 have been aroused curiosity over the years due to their various applications. Superhydrophobicity can be obtained tailoring the chemistry and the roughness of the surface, mimicking the Lotus flower. Most superhydrophobic surfaces based on secondary bonding lose their roughness in harsh conditions and are unsuitable for practical applications. Photoreactive SiO{sub 2} nanoparticles (NPs) based on benzophenone (BP) can be a very effective tool for formation of reactive species that function as a molecular bridge by covalent bonding between the NP and any polymer matrix with C-C and C-H bonds. The present work focused on thermoset radiation curing urethane acrylate. Upon UV irradiation reactive excited nπ* triplet benzophenone species are formed and react through hydrogen abstraction to form ketyl radicals which interact with a radicals from the UV irradiated polymer matrix to yield covalent bonding. Roughness was achieved by dipping the substrate in SiO{sub 2}@BPs NPs dispersion followed by irradiation. Fluoroalkylsilane was used to obtain hydrophobic top layer. AFM nano manipulation was used to verify the immobilization of NPs. Evaluation of durability was made using air flow at 300 km/hr. Preliminary results indicate the formation of super hydrophobic surfaces (CA>150 and SA<10) with improved stability.

Superhydrophobic durable coating based on UV-photoreactive silica nanoparticles

International Nuclear Information System (INIS)

Nahum, T.; Dodiuk, H.; Dotan, A.; Kenig, S.; Lellouche, J. P.

2015-01-01

Superhydrophobic surfaces with contact angle (CA) >150 and sliding angle (SA) <10 have been aroused curiosity over the years due to their various applications. Superhydrophobicity can be obtained tailoring the chemistry and the roughness of the surface, mimicking the Lotus flower. Most superhydrophobic surfaces based on secondary bonding lose their roughness in harsh conditions and are unsuitable for practical applications. Photoreactive SiO 2 nanoparticles (NPs) based on benzophenone (BP) can be a very effective tool for formation of reactive species that function as a molecular bridge by covalent bonding between the NP and any polymer matrix with C-C and C-H bonds. The present work focused on thermoset radiation curing urethane acrylate. Upon UV irradiation reactive excited nπ* triplet benzophenone species are formed and react through hydrogen abstraction to form ketyl radicals which interact with a radicals from the UV irradiated polymer matrix to yield covalent bonding. Roughness was achieved by dipping the substrate in SiO 2 @BPs NPs dispersion followed by irradiation. Fluoroalkylsilane was used to obtain hydrophobic top layer. AFM nano manipulation was used to verify the immobilization of NPs. Evaluation of durability was made using air flow at 300 km/hr. Preliminary results indicate the formation of super hydrophobic surfaces (CA>150 and SA<10) with improved stability

Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique

Directory of Open Access Journals (Sweden)

Hyeong-Ho Park, Xin Zhang, Seon-Yong Hwang, Sang Hyun Jung, Semin Kang, Hyun-Beom Shin, Ho Kwan Kang, Hyung-Ho Park, Ross H Hill and Chul Ki Ko

2012-01-01

Full Text Available We present a simple size reduction technique for fabricating 400 nm zinc oxide (ZnO architectures using a silicon master containing only microscale architectures. In this approach, the overall fabrication, from the master to the molds and the final ZnO architectures, features cost-effective UV photolithography, instead of electron beam lithography or deep-UV photolithography. A photosensitive Zn-containing sol–gel precursor was used to imprint architectures by direct UV-assisted nanoimprint lithography (UV-NIL. The resulting Zn-containing architectures were then converted to ZnO architectures with reduced feature sizes by thermal annealing at 400 °C for 1 h. The imprinted and annealed ZnO architectures were also used as new masters for the size reduction technique. ZnO pillars of 400 nm diameter were obtained from a silicon master with pillars of 1000 nm diameter by simply repeating the size reduction technique. The photosensitivity and contrast of the Zn-containing precursor were measured as 6.5 J cm−2 and 16.5, respectively. Interesting complex ZnO patterns, with both microscale pillars and nanoscale holes, were demonstrated by the combination of dose-controlled UV exposure and a two-step UV-NIL.

Simple and cost-effective fabrication of size-tunable zinc oxide architectures by multiple size reduction technique

International Nuclear Information System (INIS)

Park, Hyeong-Ho; Hwang, Seon-Yong; Jung, Sang Hyun; Kang, Semin; Shin, Hyun-Beom; Kang, Ho Kwan; Ko, Chul Ki; Zhang Xin; Hill, Ross H; Park, Hyung-Ho

2012-01-01

We present a simple size reduction technique for fabricating 400 nm zinc oxide (ZnO) architectures using a silicon master containing only microscale architectures. In this approach, the overall fabrication, from the master to the molds and the final ZnO architectures, features cost-effective UV photolithography, instead of electron beam lithography or deep-UV photolithography. A photosensitive Zn-containing sol–gel precursor was used to imprint architectures by direct UV-assisted nanoimprint lithography (UV-NIL). The resulting Zn-containing architectures were then converted to ZnO architectures with reduced feature sizes by thermal annealing at 400 °C for 1 h. The imprinted and annealed ZnO architectures were also used as new masters for the size reduction technique. ZnO pillars of 400 nm diameter were obtained from a silicon master with pillars of 1000 nm diameter by simply repeating the size reduction technique. The photosensitivity and contrast of the Zn-containing precursor were measured as 6.5 J cm −2 and 16.5, respectively. Interesting complex ZnO patterns, with both microscale pillars and nanoscale holes, were demonstrated by the combination of dose-controlled UV exposure and a two-step UV-NIL.

Molecular dynamics study of contact mechanics: contact area and interfacial separation from small to full contact

OpenAIRE

Yang, C.; Persson, B. N. J.

2007-01-01

We report a molecular dynamics study of the contact between a rigid solid with a randomly rough surface and an elastic block with a flat surface. We study the contact area and the interfacial separation from small contact (low load) to full contact (high load). For small load the contact area varies linearly with the load and the interfacial separation depends logarithmically on the load. For high load the contact area approaches to the nominal contact area (i.e., complete contact), and the i...

Influence of Heat Treatment and UV Irradiation on the Wettability of Ti35Nb10Ta Nanotubes

Directory of Open Access Journals (Sweden)

Joan Lario

2018-01-01

Full Text Available The implant osseointegration rate depends on the surface’s topography and chemical composition. There is a growing interest in the anodic oxidation process to obtain an oxide layer with a nanotube morphology on beta titanium alloys. This surface treatment presents large surface area, nanoscale rugosity and electrochemical properties that may increase the biocompatibility and osseointegration rate in titanium implants. In this work, an anodic oxidation process was used to modify the surface on the Ti35Nb10Ta alloy to obtain a titanium nanotubes topography. The work focused on analyzing the influence of some variables (voltage, heat treatment and ultraviolet irradiation on the wettability performance of a titanium alloy. The morphology of the nanotubes surfaces was studied by Field Emission Scanning Electron Microscopy (FESEM, and surface composition was analyzed by Energy Dispersive Spectroscopy (EDS. The measurement of contact angle for the TiO2 nanotube surfaces was measured by a video contact angle system. The surface with the non photoinduced nanotubes presented the largest contact angles. The post-heat treatment lowered the F/Ti ratio in the nanotubes and decreased the contact angle. Ultraviolet (UV irradiation of the TiO2 nanotubes decrease the water contact angle.

Application of UV-irradiated Fe(III)-nitrilotriacetic acid (UV-Fe(III)NTA) and UV-NTA-Fenton systems to degrade model and natural occurring naphthenic acids.

Science.gov (United States)

Zhang, Ying; Chelme-Ayala, Pamela; Klamerth, Nikolaus; Gamal El-Din, Mohamed

2017-07-01

Naphthenic acids (NAs) are a highly complex mixture of organic compounds naturally present in bitumen and identified as the primary toxic constituent of oil sands process-affected water (OSPW). This work investigated the degradation of cyclohexanoic acid (CHA), a model NA compound, and natural occurring NAs during the UV photolysis of Fe(III)-nitrilotriacetic acid (UV-Fe(III)NTA) and UV-NTA-Fenton processes. The results indicated that in the UV-Fe(III)NTA process at pH 8, the CHA removal increased with increasing NTA dose (0.18, 0.36 and 0.72 mM), while it was independent of the Fe(III) dose (0.09, 0.18 and 0.36 mM). Moreover, the three Fe concentrations had no influence on the photolysis of the Fe(III)NTA complex. The main responsible species for the CHA degradation was hydroxyl radical (OH), and the role of dissolved O 2 in the OH generation was found to be negligible. Real OSPW was treated with the UV-Fe(III)NTA and UV-NTA-Fenton advanced oxidation processes (AOPs). The removals of classical NAs (O 2 -NAs), oxidized NAs with one additional oxygen atom (O 3 -NAs) and with two additional oxygen atoms (O 4 -NAs) were 44.5%, 21.3%, and 25.2% in the UV-Fe(III)NTA process, respectively, and 98.4%, 86.0%, and 81.0% in the UV-NTA-Fenton process, respectively. There was no influence of O 2 on the NA removal in these two processes. The results also confirmed the high reactivity of the O 2 -NA species with more carbons and increasing number of rings or double bond equivalents. This work opens a new window for the possible treatment of OSPW at natural pH using these AOPs. Copyright © 2017 Elsevier Ltd. All rights reserved.

Optimal contact definition for reconstruction of Contact Maps

Directory of Open Access Journals (Sweden)

Stehr Henning

2010-05-01

Full Text Available Abstract Background Contact maps have been extensively used as a simplified representation of protein structures. They capture most important features of a protein's fold, being preferred by a number of researchers for the description and study of protein structures. Inspired by the model's simplicity many groups have dedicated a considerable amount of effort towards contact prediction as a proxy for protein structure prediction. However a contact map's biological interest is subject to the availability of reliable methods for the 3-dimensional reconstruction of the structure. Results We use an implementation of the well-known distance geometry protocol to build realistic protein 3-dimensional models from contact maps, performing an extensive exploration of many of the parameters involved in the reconstruction process. We try to address the questions: a to what accuracy does a contact map represent its corresponding 3D structure, b what is the best contact map representation with regard to reconstructability and c what is the effect of partial or inaccurate contact information on the 3D structure recovery. Our results suggest that contact maps derived from the application of a distance cutoff of 9 to 11Å around the Cβ atoms constitute the most accurate representation of the 3D structure. The reconstruction process does not provide a single solution to the problem but rather an ensemble of conformations that are within 2Å RMSD of the crystal structure and with lower values for the pairwise average ensemble RMSD. Interestingly it is still possible to recover a structure with partial contact information, although wrong contacts can lead to dramatic loss in reconstruction fidelity. Conclusions Thus contact maps represent a valid approximation to the structures with an accuracy comparable to that of experimental methods. The optimal contact definitions constitute key guidelines for methods based on contact maps such as structure prediction through

Hydrodynamic simulation of X-UV laser-produced plasmas

International Nuclear Information System (INIS)

Fajardo, M.; Zeitoun, P.; Gauthier, J.C.

2004-01-01

With the construction of novel X-UV sources, such as V-UV FEL's (free-electron lasers), X-UV laser-matter interaction will become available at ultra-high intensities. But even table-top facilities such as X-UV lasers or High Harmonic Generation, are starting to reach intensities high enough to produce dense plasmas. X-UV laser-matter interaction is studied by a 1-dimensional hydrodynamic Lagrangian code with radiative transfer for a range of interesting X-UV sources. Heating is found to be very different for Z=12-14 elements having L-edges around the X-UV laser wavelength. Possible absorption mechanisms were investigated in order to explain this behaviour, and interaction with cold dense matter proved to be dominant. Plasma sensitivity to X-UV laser parameters such as energy, pulse duration, and wavelength was also studied, covering ranges of existing X-UV lasers. We found that X-UV laser-produced plasmas could be studied using table-top lasers, paving the way for future V-UV-FEL high intensity experiments. (authors)

Cytoprotective effect against UV-induced DNA damage and oxidative stress: role of new biological UV filter.

Science.gov (United States)

Said, T; Dutot, M; Martin, C; Beaudeux, J-L; Boucher, C; Enee, E; Baudouin, C; Warnet, J-M; Rat, P

2007-03-01

The majority of chemical solar filters are cytotoxic, particularly on sensitive ocular cells (corneal and conjunctival cells). Consequently, a non-cytotoxic UV filter would be interesting in dermatology, but more especially in ophthalmology. In fact, light damage to the eye can be avoided thanks to a very efficient ocular antioxidant system; indeed, the chromophores absorb light and dissipate its energy. After middle age, a decrease in the production of antioxidants and antioxidative enzymes appears with accumulation of endogenous molecules that are phototoxic. UV radiations can induce reactive oxygen species formation, leading to various ocular diseases. Because most UV filters are cytotoxic for the eye, we investigated the anti-UV properties of Calophyllum inophyllum oil in order to propose it as a potential vehicle, free of toxicity, with a natural UV filter action in ophthalmic formulation. Calophyllum inophyllum oil, even at low concentration (1/10,000, v/v), exhibited significant UV absorption properties (maximum at 300nm) and was associated with an important sun protection factor (18-22). Oil concentrations up to 1% were not cytotoxic on human conjunctival epithelial cells, and Calophyllum inophyllum oil appeared to act as a cytoprotective agent against oxidative stress and DNA damage (85% of the DNA damage induced by UV radiations were inhibited with 1% Calophyllum oil) and did not induce in vivo ocular irritation (Draize test on New Zealand rabbits). Calophyllum inophyllum oil thus exhibited antioxidant and cytoprotective properties, and therefore might serve, for the first time, as a natural UV filter in ophthalmic preparations.

Ozone layer - climate change interactions. Influence on UV levels and UV related effects

NARCIS (Netherlands)

Kelfkens G; Bregman A; de Gruijl FR; van der Leun JC; Piquet A; van Oijen T; Gieskes WWC; van Loveren H; Velders GJM; Martens P; Slaper H; NOP; LPI; LLO

2002-01-01

Ozone in the atmosphere serves as a partially protective filter against the most harmful part of the solar UV-spectrum. Decreases in ozone lead to increases in ambient UV with a wide variety of adverse effects on human health, aquatic and terrestrial ecosystems and food chains. Human health

Distinct UV-B and UV-A/blue light signal transduction pathways induce chalcone synthase gene expression in Arabidopsis cells

International Nuclear Information System (INIS)

Christie, J.M.; Jenkins, G.I.

1996-01-01

UV and blue light control the expression of flavonoid biosynthesis genes in a range of higher plants. To investigate the signal transduction processes involved in the induction of chalcone synthase (CHS) gene expression by UV-B and UV-A/blue light, we examined the, effects of specific agonists and inhibitors of known signaling components in mammalian systems in a photomixotrophic Arabidopsis cell suspension culture. CHS expression is induced specifically by these wavelengths in the cell culture, in a manner similar to that in mature Arabidopsis leaf tissue. Both the UV-B and UV-A/blue phototransduction processes involve calcium, although the elevation of cytosolic calcium is insufficient on its own to stimulate CHS expression. The UV-A/blue light induction of CHS expression does not appear to involve calmodulin, whereas the UV-B response does; this difference indicates that the signal transduction pathways are, at least in part, distinct. We provide evidence that both pathways involve reversible protein phosphorylation and require protein synthesis. The UV-B and UV-A/blue light signaling pathways are therefore different from the phytochrome signal transduction pathway regulating CHS expression in other species

Patterning of nanoparticulate transparent conductive ITO films using UV light irradiation and UV laser beam writing

International Nuclear Information System (INIS)

Solieman, A.; Moharram, A.H.; Aegerter, M.A.

2010-01-01

Indium tin oxide (ITO) thin film is one of the most widely used as transparent conductive electrodes in all forms of flat panel display (FPD) and microelectronic devices. Suspension of already crystalline conductive ITO nanoparticles fully dispersed in alcohol was spun, after modifying with coupling agent, on glass substrates. The low cost, simple and versatile traditional photolithography process without complication of the photoresist layer was used for patterning ITO films. Using of UV light irradiation through mask and direct UV laser beam writing resulted in an accurate linear, sharp edge and very smooth patterns. Irradiated ITO film showed a high transparency (∼85%) in the visible region. The electrical sheet resistance decrease with increasing time of exposure to UV light and UV laser. Only 5 min UV light irradiation is enough to decrease the electrical sheet resistance down to 5 kΩ□.

Comparison of UV-LED and low pressure UV for water disinfection: Photoreactivation and dark repair of Escherichia coli.

Science.gov (United States)

Li, Guo-Qiang; Wang, Wen-Long; Huo, Zheng-Yang; Lu, Yun; Hu, Hong-Ying

2017-12-01

Studies on ultraviolet light-emitting diode (UV-LED) water disinfection have shown advantages, such as safety, flexible design, and lower starting voltages. However, information about reactivation after UV-LED disinfection is limited, which is an important issue of UV light-based technology. In this study, the photoreactivation and dark repair of Escherichia coli after UV-LEDs and low pressure (LP) UV disinfection were compared. Four UV-LED units, 265 nm, 280 nm, the combination of 265 + 280 (50%), and 265 + 280 (75%) were tested. 265 nm LEDs was more effective than 280 nm LEDs and LP UV lamps for E. coli inactivation. No synergic effect for disinfection was observed from the combination of 265 and 280 nm LEDs. 265 nm LEDs had no different reactivation performances with that of LP UV, while 280 nm LEDs could significantly repress photoreactivation and dark repair at a low irradiation intensity of 6.9 mJ/cm 2 . Furthermore, the UV-induced damage of 280 nm LEDs was less repaired which was determined by endonuclease sensitive site (ESS) assay. The impaired protein activities by 280 nm LEDs might be one of the reasons that inhibited reactivation. A new reactivation rate constant, K max , was introduced into the logistic model to simulate the reactivation data, which showed positive relationship with the maximum survival ratio and was more reasonable to interpret the results of photoreactivation and dark repair. This study revealed the distinct roles of different UV lights in disinfection and reactivation, which is helpful for the future design of UV-LED equipment. Copyright © 2017 Elsevier Ltd. All rights reserved.

Contact angle and local wetting at contact line.

Science.gov (United States)

Li, Ri; Shan, Yanguang

2012-11-06

This theoretical study was motivated by recent experiments and theoretical work that had suggested the dependence of the static contact angle on the local wetting at the triple-phase contact line. We revisit this topic because the static contact angle as a local wetting parameter is still not widely understood and clearly known. To further clarify the relationship of the static contact angle with wetting, two approaches are applied to derive a general equation for the static contact angle of a droplet on a composite surface composed of heterogeneous components. A global approach based on the free surface energy of a thermodynamic system containing the droplet and solid surface shows the static contact angle as a function of local surface chemistry and local wetting state at the contact line. A local approach, in which only local forces acting on the contact line are considered, results in the same equation. The fact that the local approach agrees with the global approach further demonstrates the static contact angle as a local wetting parameter. Additionally, the study also suggests that the wetting described by the Wenzel and Cassie equations is also the local wetting of the contact line rather than the global wetting of the droplet.

[Sport injuries in full contact and semi-contact karate].

Science.gov (United States)

Greier, K; Riechelmann, H; Ziemska, J

2014-03-01

Karate enjoys great popularity both in professional and recreational sports and can be classified into full, half and low contact styles. The aim of this study was the analysis of sports injuries in Kyokushinkai (full contact) and traditional Karate (semi-contact). In a retrospective study design, 215 active amateur karateka (114 full contact, 101 semi-contact) were interviewed by means of a standardised questionnaire regarding typical sport injuries during the last 36 months. Injuries were categorised into severity grade I (not requiring medical treatment), grade II (single medical treatment), grade III (several outpatient medical treatments) and grade IV (requiring hospitalisation). In total, 217 injuries were reported in detail. 125 injuries (58%) occurred in full contact and 92 (42%) in semi-contact karate. The time related injury rate of full contact karateka was 1.9/1000 h compared to 1.3/1000 h of semi-contact karateka (p injuries were musculoskeletal contusions (33% full contact, 20% semi-contact), followed by articular sprains with 19% and 16%. The lower extremity was affected twice as often in full contact (40%) as in semi-contact (20%) karate. Training injuries were reported by 80% of the full contact and 77% of the semi-contact karateka. Most injuries, both in training and competition, occurred in kumite. 75% of the reported injuries of full contact and 70% of semi-contact karateka were classified as low grade (I or II). The high rate of injuries during training and kumite (sparring) points to specific prevention goals. The emphasis should be put on proprioceptive training and consistent warm-up. In the actual competition the referees play a vital role regarding prevention. © Georg Thieme Verlag KG Stuttgart · New York.

UV-LEDs Efficiently Inactivate DNA and RNA Coliphages

Directory of Open Access Journals (Sweden)

Alyaa M. Zyara

2017-01-01

Full Text Available UV-LEDs are a new method of disinfecting drinking water. Some viruses are very resistant to UV and the efficiency of UV-LEDs to disinfect them needs to be studied. Drinking water was disinfected with UV-LEDs after spiking the water with MS2 and four UV- and/or Cl-resistant coliphages belonging to RNA or DNA coliphages isolated from municipal wastewater. UV-LEDs operating at a wavelength of 270 nm for 2 min with 120 mW of irradiation caused 0.93–2.73 Log10-reductions of coliphages tested in a reactor of a 5.2 L volume. Irradiation time of 10 min in the same system increased the Log10-reductions to 4.30–5.16. Traditional mercury UV (Hg-UV lamp at a 254 nm wavelength caused 0.67–4.08 Log10-reductions in 2 min and 4.56–7.21 Log10-reductions in 10 min in 10 mL of water. All coliphages tested except MS2 achieved 4 Log10-reductions with UV-LEDs at a dose that corresponded to 70 mWs/cm2 using Hg-UV. Thus, UV-LEDs are a promising method of disinfecting UV- and/or Cl-resistant viruses.

Effect of preparation and processing conditions on UV absorbing properties of hydroxyapatite-Fe2O3 sunscreen.

Science.gov (United States)

C Teixeira, M A; Piccirillo, C; Tobaldi, D M; Pullar, R C; Labrincha, J A; Ferreira, M O; L Castro, P M; E Pintado, M M

2017-02-01

The development of innovative, safe and non-photocatalytic sunscreens is urgently needed, as it is essential to have sunscreen filters offering appropriate UV protection without damaging the environment and/or generating free radicals when in contact with the skin. Hydroxyapatite (Ca 10 (PO 4 ) 6 (OH) 2 , HAp) when substituted with iron has UV protection properties and is not photocatalytic; HAp was used to make a sunscreen filter by treating cod fish bones in an iron-containing solution, and then calcining them at 700°C. Here we present a systematic and advanced study on this material, to obtain a sunscreen with improved UV absorbing properties. Bones were treated with three different iron salts - Fe(II) chloride, Fe(II) lactate and Fe(III) nitrate - under various pH conditions. Results showed that Fe(II) chloride in basic pH led to the most effective iron inclusion. High energy ball milling or ultrasound were investigated to increase surface area and corresponding UV absorption; high energy ball milling treatment led to the best optical properties. The optimum powders were used to formulate UV protection creams, which showed Sun Protection Factor (SPF) values significantly superior to the control cream (up to 4.1). Moreover the critical wavelength (λ crit ) was >370nm (388-389nm) and UVA/UVB ratios were very close to 1. With these properties these sunscreens can be classified as broad UV protectors. Results also showed that combining these powders with other sunscreens (i.e. titanium dioxide), a synergic effect between the different components was also observed. This investigation showed that HAp-based sunscreens of marine origin are a valid alternative to commercial products, safe for the health of the customers and, being non-photocatalytic, do not pose a threat to the environment. Copyright © 2016 Elsevier B.V. All rights reserved.

Improved UV-B screening capacity does not prevent negative effects of ambient UV irradiance on PSII performance in High Arctic plants. Results from a six year UV exclusion study

DEFF Research Database (Denmark)

Albert, Kristian Rost; Mikkelsen, Teis Nørgaard; Ro-Poulsen, H.

2010-01-01

Long-term responses of ambient solar ultraviolet (UV) radiation were investigated on Salix arctica and Vaccinium uliginosum in a High Arctic heath ecosystem in Zackenberg, northeast Greenland. Over a period of six years, UV exclusion was conducted in the growing season by means of filters: 60% UV......, exposing the vegetation to high spring UV-B, and to be present in the future to the degree the ozone layer is not fully recovered....

Contact allergy to epoxy (meth)acrylates.

Science.gov (United States)

Aalto-Korte, Kristiina; Jungewelter, Soile; Henriks-Eckerman, Maj-Len; Kuuliala, Outi; Jolanki, Riitta

2009-07-01

Contact allergy to epoxy (meth)acrylates, 2,2-bis[4-(2-hydroxy-3-methacryloxypropoxy) phenyl]propane (bis-GMA), 2,2-bis[4-(2-hydroxy-3-acryloxypropoxy)phenyl]-propane (bis-GA), 2,2-bis[4-(methacryl-oxyethoxy)phenyl] propane (bis-EMA), 2,2-bis[4-(methacryloxy)phenyl]-propane (bis-MA), and glycidyl methacrylate (GMA) is often manifested together with contact allergy to diglycidyl ether of bisphenol A (DGEBA) epoxy resin. To analyse patterns of concomitant allergic reactions to the five epoxy (meth)acrylates in relation to exposure. We reviewed the 1994-2008 patch test files at the Finnish Institute of Occupational Health (FIOH) for reactions to the five epoxy (meth)acrylates, and examined the patients' medical records for exposure. Twenty-four patients had an allergic reaction to at least one of the studied epoxy (meth)acrylates, but specific exposure was found only in five patients: two bis-GMA allergies from dental products, two bis-GA allergies from UV-curable printing inks, and one bis-GA allergy from an anaerobic glue. Only 25% of the patients were negative to DGEBA epoxy resin. The great majority of allergic patch test reactions to bis-GMA, bis-GA, GMA and bis-EMA were not associated with specific exposure, and cross-allergy to DGEBA epoxy resin remained a probable explanation. However, independent reactions to bis-GA indicated specific exposure. Anaerobic sealants may induce sensitization not only to aliphatic (meth)acrylates but also to aromatic bis-GA.

Removal of sulfamethoxazole, ibuprofen and nitrobenzene by UV and UV/chlorine processes: A comparative evaluation of 275 nm LED-UV and 254 nm LP-UV.

Science.gov (United States)

Kwon, Minhwan; Yoon, Yeojoon; Kim, Seonbaek; Jung, Youmi; Hwang, Tae-Mun; Kang, Joon-Wun

2018-05-15

The aim of this study is to evaluate the micropollutant removal capacity of a 275 nm light-emitting diode (LED)-UV/chlorine system. The sulfamethoxazole, ibuprofen, and nitrobenzene removal efficiencies of this system were compared with those of a conventional 254 nm low-pressure (LP)-UV system as a function of the UV dose. In a direct photolysis system, the photon reactivity of sulfamethoxazole is higher than that of nitrobenzene and ibuprofen at both wavelengths. The molar absorption coefficients and quantum yields of each micropollutant were as follows: sulfamethoxazole (ε SMX, 275 nm protonated  = 17,527 M -1  cm -1 , Φ SMX, 275 nm protonated  = 0.239, ε SMX, 275 nm deprotonated  = 8430 M -1  cm -1 , and Φ SMX, 275 nm deprotonated  = 0.026), nitrobenzene (ε NB, 275 nm  = 7176 M -1  cm -1 and Φ NB, 275 nm  = 0.057), and ibuprofen (ε NB, 275 nm  = 200 M -1  cm -1 and Φ IBF, 275 nm  = 0.067). The photon reactivity of chlorine species, i.e., HOCl and OCl-, were determined at 275 nm (ε HOCl, 275 nm  = 28 M -1  cm -1 , Φ HOCl, 275 nm  = 1.97, ε OCl-, 275 nm  = 245 M -1  cm -1 , and Φ OCl-, 275 nm  = 0.8), which indicate that the decomposition rate of OCl - is higher and that of HOCl is lower by 275 nm photolysis than that by 254 nm photolysis (ε HOCl, 254 nm  = 60 M -1  cm -1 , Φ HOCl, 254 nm  = 1.46, ε OCl-, 254 nm  = 58 M -1  cm -1 , and Φ OCl-, 254 nm  = 1.11). In the UV/chlorine system, the removal rates of ibuprofen and nitrobenzene were increased by the formation of OH and reactive chlorine species. The 275-nm LED-UV/chlorine system has higher radical yields at pH 7 and 8 than the 254 nm LP-UV/chlorine system. Copyright © 2018 Elsevier B.V. All rights reserved.

Effects of UV radiation on phytoplankton

Science.gov (United States)

Smith, Raymond C.; Cullen, John J.

1995-07-01

It is now widely documented that reduced ozone will result in increased levels of ultraviolet (UV) radiation, especially UV-B (280-320nm), incident at the surface of the earth [Watson, 1988; Anderson et al., 1991; Schoeberl and Hartmann, 1991; Frederick and Alberts, 1991; WMO, 1991; Madronich, 1993; Kerr and McElroy, 1993], and there is considerable and increasing evidence that these higher levels of UV-B radiation may be detrimental to various forms of marine life in the upper layers of the ocean. With respect to aquatic ecosystems, we also know that this biologically- damaging mid-ultraviolet radiation can penetrate to ecologically- significant depths in marine and freshwater systems [Jerlov, 1950; Lenoble, 1956; Smith and Baker, 1979; Smith and Baker, 1980; Smith and Baker, 1981; Kirk et al., 1994]. This knowledge, plus the dramatic decline in stratospheric ozone over the Antarctic continent each spring, now known to be caused by anthropogenically released chemicals [Solomon, 1990; Booth et al., 1994], has resulted in increased UV-environmental research and a number of summary reports. The United Nations Environmental Program (UNEP) has provided recent updates with respect to the effects of ozone depletion on aquatic ecosystems (Hader, Worrest, Kumar in UNEP 1989, 1991, Hader, Worrest, Kumar and Smith UNEP 1994) and the Scientific Committee on Problems of the Environment (SCOPE) has provided [SCOPE, 1992] a summary of the effects of increased UV radiation on biological systems. SCOPE has also reported [SCOPE, 1993] on the effects of increased UV on the biosphere. In addition, several books have recently been published reviewing various aspects of environmental UV photobiology [Young et al., 1993], UV effects on humans, animals and plants [Tevini, 1993], the biological effects of UV radiation in Antarctica [Weiler and Penhale, 1994], and UV research in freshwater ecosystems [Williamson and Zagarese, 1994]. Several other reviews are relevant [NAS, 1984; Caldwell

Sulfonation of polyester fabrics by gaseous sulfur oxide activated by UV irradiation

Energy Technology Data Exchange (ETDEWEB)

Kordoghli, Bessem [Laboratory of Applied Chemical and Environment (UR-CAE) - University of Monastir (Tunisia); Textile Research Laboratory (LRT) - ISET Kasr Hellal, University of Monastir (Tunisia); Khiari, Ramzi, E-mail: khiari_ramzi2000@yahoo.fr [Laboratory of Applied Chemical and Environment (UR-CAE) - University of Monastir (Tunisia); LGP2 - Laboratory of Pulp and Paper Science, 461, Rue de la Papeterie - BP 65, 38402 Saint Martin d' Heres Cedex (France); Mhenni, Mohamed Farouk [Laboratory of Applied Chemical and Environment (UR-CAE) - University of Monastir (Tunisia); Sakli, Faouzi [Textile Research Laboratory (LRT) - ISET Kasr Hellal, University of Monastir (Tunisia); Belgacem, Mohamed Naceur [LGP2 - Laboratory of Pulp and Paper Science, 461, Rue de la Papeterie - BP 65, 38402 Saint Martin d' Heres Cedex (France)

2012-10-01

Highlights: Black-Right-Pointing-Pointer In this paper, an original technique was present to improve the hydrophilic properties of polyester fibres. Black-Right-Pointing-Pointer The modification of PET fabric was carried out using gaseous sulfur trioxide activated by UV irradiations. Black-Right-Pointing-Pointer We fully characterized the modified and untreated fabrics. - Abstract: This paper describes an original technique aiming to improve the hydrophilic properties of polyester fibres. In this method, the sulfonation of the aromatic rings is carried out using gaseous sulfur trioxide activated by UV irradiations. Thus, exposing the polyester textile fabric to the UVC light (wavelength around 254 nm) under a stream of sulfur trioxide leads to the fixation of -SO{sub 3}H groups. The amounts of the fixed sulfonate groups depended on the reaction conditions. Evidence of grafting deduced from the measurements of hygroscopic properties was carried out by contact angle measurement, moisture regain as well as by measuring the rate of retention. SEM and FT-IR analysis, DSC and DTA/TGA thermograms showed that no significant modifications have occurred in the bulk of the treated PET fabrics.

Contact and Non-contact Measurements of Grinding Pins

Directory of Open Access Journals (Sweden)

Magdziak Marek

2015-01-01

Full Text Available The paper presents the results of contact and non-contact measurements of external profiles of selected grinding pins. The measurements were conducted in order to choose the appropriate measuring technique in the case of the considered measurement task. In the case of contact measurements the coordinate measuring machine ACCURA II was applied. The used coordinate measuring machine was equipped with the contact scanning probe VAST XT and the Calypso inspection software. Contact coordinate measurements were performed by using of different measurement strategies. The applied strategies included different scanning velocities and distances between measured points. Non-contact measurements were conducted by means of the tool presetter produced by the Mahr company. On the basis of gained results the guidelines concerning measurements of grinding pins were formulated. The measurements of analyzed grinding pins performed by means of the non-contact measuring system are characterized by higher reproducibility than the contact measurements. The low reproducibility of contact measurements may be connected with the inaccuracy of the selected coordinate measuring machine and the measuring probe, the measurement parameters and environmental conditions in the laboratory where the coordinate measuring machine is located. Moreover, the paper presents the possible application of results of conducted investigations. The results of non-contact measurements can be used in the simulation studies of grinding processes. The simulations may reduce the costs of machining processes.

Fabrication of high-brightness GaN-based light-emitting diodes via thermal nanoimprinting of ZnO-nanoparticle-dispersed resin

International Nuclear Information System (INIS)

Byeon, Kyeong-Jae; Cho, Joong-Yeon; Jo, Han-Byeol; Lee, Heon

2015-01-01

Highlights: • A various high-refractive-index ZnO patterns were formed on LED using imprinting. • Mechanism of light extraction enhancement was demonstrated by simulation and EL. • Light output power of patterned LED was improved up 19.6% by light waveguide effect. - Abstract: We fabricated high-brightness GaN-based light-emitting diodes (LEDs) with highly refractive patterned structures by using a thermal nanoimprint lithography (NIL). A highly refractive ZnO-nanoparticle-dispersed resin (ZNDR) was used in NIL, and a submicron hole, a submicron high-aspect-ratio pillar, and microconvex arrays were fabricated on the indium tin oxide (ITO) top electrode of GaN-based LED devices. We analyzed the light extraction mechanism for each of the three types of patterns by using a finite element method simulation, and found that the high-aspect-ratio pillar had a great ability to improve light extraction owing to its waveguide effect and prominent scattering effect. As a result, the light output power, which was measured in an integrating sphere, of the LED device was enhanced by up to 19.6% when the high-aspect-ratio pillar array was formed on the top ITO electrode of the device. Further, the electrical properties of none of the patterned LED devices fabricated using ZNDR degraded in comparison to those of bare LED devices

Quality assurance of the UV irradiances of the UV-B Monitoring and Research Program: the Mauna Loa test case

Science.gov (United States)

Zempila, Melina Maria; Davis, John; Janson, George; Olson, Becky; Chen, Maosi; Durham, Bill; Simpson, Scott; Straube, Jonathan; Sun, Zhibin; Gao, Wei

2017-09-01

The USDA UV-B Monitoring and Research Program (UVMRP) is an ongoing effort aiming to establish a valuable, longstanding database of ground-based ultraviolet (UV) solar radiation measurements over the US. Furthermore, the program aims to achieve a better understanding of UV variations through time, and develop a UV climatology for the Northern American section. By providing high quality radiometric measurements of UV solar radiation, UVMRP is also focusing on advancing science for agricultural, forest, and range systems in order to mitigate climate impacts. Within these foci, the goal of the present study is to investigate, analyze, and validate the accuracy of the measurements of the UV multi-filter rotating shadowband radiometer (UV-MFRSR) and Yankee (YES) UVB-1 sensor at the high altitude, pristine site at Mauna Loa, Hawaii. The response-weighted irradiances at 7 UV channels of the UV-MFRSR along with the erythemal dose rates from the UVB-1 radiometer are discussed, and evaluated for the period 2006-2015. Uncertainties during the calibration procedures are also analyzed, while collocated groundbased measurements from a Brewer spectrophotometer along with model simulations are used as a baseline for the validation of the data. Besides this quantitative research, the limitations and merits of the existing UVMRP methods are considered and further improvements are introduced.

Fabrication of complex nanoscale structures on various substrates

Science.gov (United States)

Han, Kang-Soo; Hong, Sung-Hoon; Lee, Heon

2007-09-01

Polymer based complex nanoscale structures were fabricated and transferred to various substrates using reverse nanoimprint lithography. To facilitate the fabrication and transference of the large area of the nanostructured layer to the substrates, a water-soluble polyvinyl alcohol mold was used. After generation and transference of the nanostructured layer, the polyvinyl alcohol mold was removed by dissolving in water. A residue-free, UV-curable, glue layer was formulated and used to bond the nanostructured layer onto the substrates. As a result, nanometer scale patterned polymer layers were bonded to various substrates and three-dimensional nanostructures were also fabricated by stacking of the layers.

Degradation mechanisms of Microcystin-LR during UV-B photolysis and UV/H2O2 processes: Byproducts and pathways.

Science.gov (United States)

Moon, Bo-Ram; Kim, Tae-Kyoung; Kim, Moon-Kyung; Choi, Jaewon; Zoh, Kyung-Duk

2017-10-01

The removal and degradation pathways of microcystin-LR (MC-LR, [M+H] +  = 995.6) in UV-B photolysis and UV-B/H 2 O 2 processes were examined using liquid chromatography-tandem mass spectrometry. The UV/H 2 O 2 process was more efficient than UV-B photolysis for MC-LR removal. Eight by-products were newly identified in the UV-B photolysis ([M+H] +  = 414.3, 417.3, 709.6, 428.9, 608.6, 847.5, 807.4, and 823.6), and eleven by-products were identified in the UV-B/H 2 O 2 process ([M+H] +  = 707.4, 414.7, 429.3, 445.3, 608.6, 1052.0, 313.4, 823.6, 357.3, 245.2, and 805.7). Most of the MC-LR by-products had lower [M+H] + values than the MC-LR itself during both processes, except for the [M+H] + value of 1052.0 during UV-B photolysis. Based on identified by-products and peak area patterns, we proposed potential degradation pathways during the two processes. Bond cleavage and intramolecular electron rearrangement by electron pair in the nitrogen atom were the major reactions during UV-B photolysis and UV-B/H 2 O 2 processes, and hydroxylation by OH radical and the adduct formation reaction between the produced by-products were identified as additional pathways during the UV-B/H 2 O 2 process. Meanwhile, the degradation by-products identified from MC-LR during UV-B/H 2 O 2 process can be further degraded by increasing H 2 O 2 dose. Copyright © 2017 Elsevier Ltd. All rights reserved.

Biocompatibility of polypropylene non-woven fabric membrane via UV-induced graft polymerization of 2-acrylamido-2-methylpropane sulfonic acid

Energy Technology Data Exchange (ETDEWEB)

Song Lingjie [State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Graduate University of Chinese Academy of Sciences, Beijing 100049 (China); Zhao Jie; Yang Huawei; Jin Jing; Li Xiaomeng [State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China); Stagnaro, Paola [Istituto per Io Studio delle Macromolecole, Consiglio Nazionale delle Ricerche, Via de Marini 6, 16149 Genova (Italy); Yin Jinghua, E-mail: yinjh@ciac.jl.cn [State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022 (China)

2011-10-15

This work described the graft polymerization of a sulfonic acid terminated monomer, 2-acrylamido-2-methylpropane sulfonic acid (AMPS), onto the surface of polypropylene non-woven (NWF PP) membrane by O{sub 2} plasma pretreatment and UV-induced photografting method. The chemical structure and composition of the modified surfaces were analyzed by FTIR-ATR and XPS, respectively. The wettability was investigated by water contact angle and equilibrium water adsorption. And the biocompatibility of the modified NWF PP membranes was evaluated by protein adsorption and platelet adhesion. It was found that the graft density increased with prolonging UV irradiation time and increasing AMPS concentration; the water contact angles of the membranes decreased from 124{sup o} to 26{sup o} with the increasing grafting density of poly(AMPS) from 0 to 884.2 {mu}g cm{sup -2}, while the equilibrium water adsorption raised from 5 wt% to 75 wt%; the protein absorption was effectively suppressed with the introduction of poly(AMPS) even at the low grafting density (132.4 {mu}g cm{sup -2}); the number of platelets adhering to the modified membrane was dramatically reduced when compared with that on its virgin surface. These results indicated that surface modification of NWF PP membrane with AMPS was a facile approach to construct biocompatible surface.

Loss of photoreversibility for UV mutation in E. coli using 405 nm or near-UV challenge

International Nuclear Information System (INIS)

Kristoff, S.; Bockrath, R.

1983-01-01

E. coli mutagenized with germicidal ultraviolet light (UV) were incubated to allow for development of mutation-fixation processes. Fixation was estimated from the effects on mutation frequency of photoreactivation challenge during the first 60 min post-UV. Two different light sources were used for photoreactivation, one providing effective light primarily at 405 nm and another providing a broad range of near-UV around 365 nm. Kinetics for the loss of photoreversibility (LOP) were determined. The times for completion of LOP in wild-type cells indicated one fixation process for back mutation and another for de novo or converted suppressor mutation regardless of the light source. Using 405-nm light for photoreactivation, the LOP kinetics for back mutation and de novo suppressor mutation in uvrA cells were similar. Hence, classical observations were confirmed here. Immediately post-UV all mutation frequencies were more sensitive to near-UV than 405-nm light. (orig./AJ)

UV-B Perception and Acclimation in Chlamydomonas reinhardtii[OPEN

Science.gov (United States)

Chappuis, Richard; Allorent, Guillaume

2016-01-01

Plants perceive UV-B, an intrinsic component of sunlight, via a signaling pathway that is mediated by the photoreceptor UV RESISTANCE LOCUS8 (UVR8) and induces UV-B acclimation. To test whether similar UV-B perception mechanisms exist in the evolutionarily distant green alga Chlamydomonas reinhardtii, we identified Chlamydomonas orthologs of UVR8 and the key signaling factor CONSTITUTIVELY PHOTOMORPHOGENIC1 (COP1). Cr-UVR8 shares sequence and structural similarity to Arabidopsis thaliana UVR8, has conserved tryptophan residues for UV-B photoreception, monomerizes upon UV-B exposure, and interacts with Cr-COP1 in a UV-B-dependent manner. Moreover, Cr-UVR8 can interact with At-COP1 and complement the Arabidopsis uvr8 mutant, demonstrating that it is a functional UV-B photoreceptor. Chlamydomonas shows apparent UV-B acclimation in colony survival and photosynthetic efficiency assays. UV-B exposure, at low levels that induce acclimation, led to broad changes in the Chlamydomonas transcriptome, including in genes related to photosynthesis. Impaired UV-B-induced activation in the Cr-COP1 mutant hit1 indicates that UVR8-COP1 signaling induces transcriptome changes in response to UV-B. Also, hit1 mutants are impaired in UV-B acclimation. Chlamydomonas UV-B acclimation preserved the photosystem II core proteins D1 and D2 under UV-B stress, which mitigated UV-B-induced photoinhibition. These findings highlight the early evolution of UVR8 photoreceptor signaling in the green lineage to induce UV-B acclimation and protection. PMID:27020958

Excimer UV curing in printing

International Nuclear Information System (INIS)

Mehnert, R.

1999-01-01

It is the aim of this study to investigate the potential of 308 run excimer UV curing in web and sheet fed offset printing and to discuss its present status. Using real-time FTIR-ATR and stationary or pulsed monochromatic (313 nm) irradiation chemical and physical factors affecting the curing speed of printing inks such as nature and concentration of photo-initiators, reactivity of the ink binding system, ink thickness and pigmentation, irradiance in the curing plane, oxygen concentration and nitrogen inerting, multiple pulse exposure, the photochemical dark reaction and temperature dependence were studied. The results were used to select optimum conditions for excimer UV curing in respect to ink reactivity, nitrogen inerting and UV exposure and to build an excimer UV curing unit consisting of two 50 W/cm 308 run excimer lamps, power supply, cooling and inerting unit. The excimer UV curing devices were tested under realistic conditions on a web offset press zirkon supra forte and a sheet fed press Heidelberg GTO 52. Maximum curing speeds of 300 m/min in web offset and 8000 sheets per hour in sheet fed offset were obtained

UV dependent vitamin D syntheses. UV exposure time balancing for optimum production of the vitamins D3 status in the human body. Final report; UV-abhaengige Vitamin D Synthese. Bilanzierung der Expositionszeit durch UV zur Produktion des optimalen Vitamin D{sub 3}-Bedarfes im menschlichen Koerper. Schlussbericht

Energy Technology Data Exchange (ETDEWEB)

Knuschke, P.; Lehmann, B.; Pueschel, A.; Roensch, H.

2012-10-15

UV-dependent vitamin D{sub 3} synthesis - balancing of UV exposure time and the production of an optimal vitamin D{sub 3} status in men The adverse health effects on human skin and eyes by UV radiation have been well known for years. They are known to the public, too. Increased exposures by the UV-B fraction of solar radiation cause e.g. sun burn as an acute skin reaction or an increased risk on skin cancer as a chronic effect. Radiation of the same spectral UV-B range is necessary to induce the essential vitamin D metabolism in men. The UV-induced vitamin D synthesis in the skin supplies the body with more than 90 % while our typical nutrition contributes no more than 10 %. These photobiological effects are diametrically opposed. Therefore, up to now there are contradictory recommendations to the public concerning the health effects of solar UV exposure. The aim of this research project was to evaluate the quantitative and qualitative relations of UV exposure and the vitamin D status in men taking into account different conditions in the population. In result, well-balanced recommendations on optimal UV exposures for the different fractions of the population should be elaborated, realizing health protection aspects against detrimental UV effects. A literature survey (updated in 2011) summarizes the current knowledge on the vitamin D metabolism, on the effects of the hormone vitamin D and on the stage of the current discussion on the optimal vitamin D status. In a number of studies of this project the effects of UV exposure on the vitamin D status (25OH-vitamin D{sub 3} und 1,25OH-vitamin D{sub 3}) were investigated. Exposure parameters were the photobiologically effective UV dose (with respect to the minimal erythema dose MED = individual sun burn dose in each investigated volunteer) and the extent of the exposed skin area: face and hands (like everyday conditions) or whole body respectively. Serial UV exposures were applied by natural solar UV radiation or by

Road Signs for UV-Completion

CERN Document Server

Dvali, Gia; Gomez, Cesar

2012-01-01

We confront the concepts of Wilsonian UV-completion versus self-completion by Classicalization in theories with derivatively-coupled scalars. We observe that the information about the UV-completion road is encoded in the sign of the derivative terms. We note that the sign of the derivative couplings for which there is no consistent Wilsonian UV-completion is the one that allows for consistent classicalons. This is an indication that for such a sign the vertex must be treated as fundamental and the theory self-protects against potential inconsistencies, such as superluminality, via self-completion by classicalization. Applying this reasoning to the UV-completion of the Standard Model, we see that the information about the Higgs versus classicalization is encoded in the sign of the scattering amplitude of longitudinal W-bosons. Negative sign excludes Higgs or any other weakly-coupled Wilsonian physics.

UV scale calibration transfer from an improved pyroelectric detector standard to field UV-A meters and 365 nm excitation sources

Science.gov (United States)

Eppeldauer, G. P.; Podobedov, V. B.; Cooksey, C. C.

2017-05-01

Calibration of the emitted radiation from UV sources peaking at 365 nm, is necessary to perform the ASTM required 1 mW/cm2 minimum irradiance in certain military material (ships, airplanes etc) tests. These UV "black lights" are applied for crack-recognition using fluorescent liquid penetrant inspection. At present, these nondestructive tests are performed using Hg-lamps. Lack of a proper standard and the different spectral responsivities of the available UV meters cause significant measurement errors even if the same UV-365 source is measured. A pyroelectric radiometer standard with spectrally flat (constant) response in the UV-VIS range has been developed to solve the problem. The response curve of this standard determined from spectral reflectance measurement, is converted into spectral irradiance responsivity with UV sources (with different peaks and distributions) without using any source standard. Using this broadband calibration method, yearly spectral calibrations for the reference UV (LED) sources and irradiance meters is not needed. Field UV sources and meters can be calibrated against the pyroelectric radiometer standard for broadband (integrated) irradiance and integrated responsivity. Using the broadband measurement procedure, the UV measurements give uniform results with significantly decreased uncertainties.

Bromate formation from the oxidation of bromide in the UV/chlorine process with low pressure and medium pressure UV lamps.

Science.gov (United States)

Fang, Jingyun; Zhao, Quan; Fan, Chihhao; Shang, Chii; Fu, Yun; Zhang, Xiangru

2017-09-01

When a bromide-containing water is treated by the ultraviolet (UV)/chlorine process, hydroxyl radicals (HO) and halogen radicals such as Cl or Br are formed due to the UV photolysis of free halogens. These reactive species may induce the formation of bromate, which is a probable human carcinogen. Bromate formation in the UV/chlorine process using low pressure (LP) and medium pressure (MP) lamps in the presence of bromide was investigated in the present study. The UV/chlorine process significantly enhanced bromate formation as compared to dark chlorination. The bromate formation was elevated with increasing UV fluence, bromide concentration, and pH values under both LP and MP UV irradiations. It was significantly enhanced at pH 9 compared to those at pH 6 and 7 with MP UV irradiation, while it was slightly enhanced at pH 9 with LP UV. The formation by UV/chlorine process started with the formation of free bromine (HOBr/OBr - ) through the reaction of chlorine and bromide, followed by a subsequent oxidation of free bromine and formation of BrO and bromate by reacting with radicals. Copyright © 2017 Elsevier Ltd. All rights reserved.

UV induced thermoluminescence in rare earth oxide doped phosphors: possible use for UV dosimetry

International Nuclear Information System (INIS)

Yeh, S.-M.; Su, C.-S.

1996-01-01

UV induced thermoluminescent (TL) phenomena in some phosphors doped with rare earth oxides (Gd 2 O 3 :Eu, Gd 2 O 3 :Tb, Gd 2 O 3 :Dy and Y 2 O 3 :EU) have been investigated. Gd 2 O 3 :Eu and Y 2 O 3 :Eu have been found to possess prominent TL phenomena. A stable high temperature glow peak has been found at 345 o C in the cubic (C type) crystalline structure of Gd 2 O 3 :Eu. A more stable high temperature glow peak has also been found at about 380 o C in Y 2 O 3 :Eu. The sensitivity is high enough to be used as UV sensors. TL phenomena in Gd 2 O 3 :Tb and Gd 2 O 3 :Dy have also been investigated, but their TL intensities are much weaker than that of Gd 2 O 3 :Eu or Y 2 O 3 :Eu. On the other hand, all glow peaks of Gd 2 O 3 :Tb and Gd 2 O 3 :Dy are unstable at room temperature, therefore, Gd 2 O 3 :Tb and Gd 2 O 3 :Dy are not suitable for use as UV detectors. According to the above properties, the C type (cubic) crystalline structure of the Gd 2 O 3 :Eu phosphor seems to possess the potential of being the TL material for UV measurement. The position of the high temperature glow peak depends on the total UV exposure. It locates at about 380 o C when this phosphor was irradiated by 302 nm UV at 2.4 mJ.cm -2 exposure, but it shifts to 345 o C at 19.2 mJ.cm -2 or higher exposure. The response curves of this phosphor for various wavelengths, e.g. 253.7 nm, 302 nm, and 365 nm, were also measured. This phosphor is sensitive enough to measure background UV radiations, such as sunlight, bulb light etc. (author)

UV imaging in pharmaceutical analysis

DEFF Research Database (Denmark)

Østergaard, Jesper

2018-01-01

UV imaging provides spatially and temporally resolved absorbance measurements, which are highly useful in pharmaceutical analysis. Commercial UV imaging instrumentation was originally developed as a detector for separation sciences, but the main use is in the area of in vitro dissolution...

Comparison of UV-C and Pulsed UV Light Treatments for Reduction of Salmonella, Listeria monocytogenes, and Enterohemorrhagic Escherichia coli on Eggs.

Science.gov (United States)

Holck, Askild L; Liland, Kristian H; Drømtorp, Signe M; Carlehög, Mats; McLEOD, Anette

2018-01-01

Ten percent of all strong-evidence foodborne outbreaks in the European Union are caused by Salmonella related to eggs and egg products. UV light may be used to decontaminate egg surfaces and reduce the risk of human salmonellosis infections. The efficiency of continuous UV-C (254 nm) and pulsed UV light for reducing the viability of Salmonella Enteritidis, Listeria monocytogenes, and enterohemorrhagic Escherichia coli on eggs was thoroughly compared. Bacterial cells were exposed to UV-C light at fluences from 0.05 to 3.0 J/cm 2 (10 mW/cm 2 , for 5 to 300 s) and pulsed UV light at fluences from 1.25 to 18.0 J/cm 2 , resulting in reductions ranging from 1.6 to 3.8 log, depending on conditions used. Using UV-C light, it was possible to achieve higher reductions at lower fluences compared with pulsed UV light. When Salmonella was stacked on a small area or shielded in feces, the pulsed UV light seemed to have a higher penetration capacity and gave higher bacterial reductions. Microscopy imaging and attempts to contaminate the interior of the eggs with Salmonella through the eggshell demonstrated that the integrity of the eggshell was maintained after UV light treatments. Only minor sensory changes were reported by panelists when the highest UV doses were used. UV-C and pulsed UV light treatments appear to be useful decontamination technologies that can be implemented in continuous processing.

UV spectroscopy. Ch. 16

International Nuclear Information System (INIS)

Stevens, Eugene S.

1991-01-01

The use of synchrotron radiation (SR) in the ultraviolet (UV) region by biophysics and biophysical chemists continues to increase as access improves and as awareness of its unique combination of properties grows. SR is continuously tunable, intense (even in the UV region), and pulsed. Pulse characteristics are comparable to those of picosecond lasers, but have the advantage of being independent of wavelength. Drawbacks are the continuous, but slow, decay of intensity arising from loss of particles in the ring, and the intrinsic limitation in pulse repetition rate. The particular combination of features that makes SR a superior light source depends upon the application. Spectroscopic techniques based on absorption and some techniques based on emission exploit its intensity and continuous tunability; time resolved techniques make use of its pulse characteristics. This chapter is a status report on two of the major biological applications of UV SR, circular dichroism and time-resolved fluorescence, covering mainly the published literature of the last five years. For the present purpose, the term UV is understood to include the vacuum ultraviolet region to 100 nm. (author). 83 refs.; 4 figs.; 6 tabs

Environment Canada's Children's UV Index Sun Awareness Programme

International Nuclear Information System (INIS)

Fergusson, A.

2000-01-01

In 1992, Canada introduced the UV Index forecast programme to increase public awareness of UV radiation, to support health agencies in educating the public about UV risks, and to assist individuals in making healthy lifestyle decisions. A national sun health survey in 1997 indicated that about half of adults reported taking extra precautions to protect themselves from the sun on days when the UV Index was rated 'high'. In response to this concern in 1998, Environment Canada produced an UN Index poster that was sent to 3000 elementary schools across Canada. The poster targeted children between the ages of 8 and 15 and provided information to minimise the risk to their health from solar UV radiation without spoiling their outdoor fun. Based on this experience Environment Canada produced in 1999, the Daily UV Index and Calendar Poster that was sent to 14,000 elementary schools across Canada. An UV Index website has been created to provide information to students and teachers on the science of UV radiation and the UV Index. (author)

UV-blocking potential of oils and juices.

Science.gov (United States)

Gause, S; Chauhan, A

2016-08-01

Sunscreens are commonly used to protect the body from damage caused by UV light. Some components of organic sunscreens have been shown to pass through the skin during wear which could raise toxicity concerns for these compounds. This study explores the potential for oils and fruit and vegetable juices to be substitutes for these compounds. The absorptivity of various oils (canola oil, citronella oil, coconut oil, olive oil, soya bean oil, vitamin E, as well as aloe vera) and fruit and vegetable juices (acerola, beet, grape, orange carrot, purple carrot and raspberry) was measured in vitro. The mean absorptivity was compared with FDA-approved UV absorbers to gauge the potential of the natural products. The most promising candidates were incorporated into formulations, and the UV transmittance of a 20-μm-thick film of the formulation was measured. The formulations were also imaged by light microscopy and scanning electron microscopy. The absorptivity of oils was at least two orders of magnitude lower compared to the commercial UV blockers. The fruit juice powders were more effective at UV blocking but still showed an order of magnitude lower absorptivity compared to commercial UV blockers. The UV blocking from most natural oils is insufficient to obtain a significant UV protection. Formulations containing 50wt% purple carrot showed good UV-blocking capabilities and represent a promising ingredient for sunscreen and cosmetic applications. © 2015 Society of Cosmetic Scientists and the Société Française de Cosmétologie.

Low cost UV-Ozone reactor mounted for treatment of electrode anodes used in P-OLEDs devices

Directory of Open Access Journals (Sweden)

Emerson Roberto Santos

Full Text Available Abstract Low cost UV-Ozone reactor using a high pressure mercury vapor lamp of 80 watts without outer bulb showed good results for treatment of ITO films used as anode electrode in the assembly of P-OLED (polymer-organic light emitting diode devices. This study revealed 20 minutes as effective treatment time and it was verified also that the effect of UV-Ozone treatment loses its efficiency as the elapsed time increases. It was analyzed with measurements of contact angle using a droplet of PEDOT:PSS polymer. P-OLEDs devices were mounted with architecture: ITO/PEDOT:PSS/PVK/Alq3/Al. The PVK polymer was diluted in organic solvent of 1,2,4-trichlorobenzene with concentrations of: 5, 10, 20 and 30 mg/mL. Results revealed better performance of P-OLED devices for concentration of 5 mg/mL resulting in lower threshold voltage, elevation of electrical current and similar diode curve.

UV Reconstruction Algorithm And Diurnal Cycle Variability

Science.gov (United States)

Curylo, Aleksander; Litynska, Zenobia; Krzyscin, Janusz; Bogdanska, Barbara

2009-03-01

UV reconstruction is a method of estimation of surface UV with the use of available actinometrical and aerological measurements. UV reconstruction is necessary for the study of long-term UV change. A typical series of UV measurements is not longer than 15 years, which is too short for trend estimation. The essential problem in the reconstruction algorithm is the good parameterization of clouds. In our previous algorithm we used an empirical relation between Cloud Modification Factor (CMF) in global radiation and CMF in UV. The CMF is defined as the ratio between measured and modelled irradiances. Clear sky irradiance was calculated with a solar radiative transfer model. In the proposed algorithm, the time variability of global radiation during the diurnal cycle is used as an additional source of information. For elaborating an improved reconstruction algorithm relevant data from Legionowo [52.4 N, 21.0 E, 96 m a.s.l], Poland were collected with the following instruments: NILU-UV multi channel radiometer, Kipp&Zonen pyranometer, radiosonde profiles of ozone, humidity and temperature. The proposed algorithm has been used for reconstruction of UV at four Polish sites: Mikolajki, Kolobrzeg, Warszawa-Bielany and Zakopane since the early 1960s. Krzyscin's reconstruction of total ozone has been used in the calculations.

Study of UV-mutagenesis in Bacillus subtilis

International Nuclear Information System (INIS)

Lotareva, O.V.; Filippov, V.D.

1974-01-01

The sensitivity of Bac. subtilis to the inactivating and mutagenic effects of UV-mutants has been determined: uvr, which does not extract pyrimidine dimers from damaged DNA; recsub(x), which exhibits a reduced activity of ATP-dependent DNAase; poll, which is devoid of DNA polymerase, and wild strains (DT). The sensitivity of these strains to the inactivating effects of UV rays increases in the order: DT<= recsub(x) << uvr < poll, and UV mutability in the order: DT = rec(sub(x) < poll<< uvr. A comparison of UV mutagenesis in Bac. subtilis and E. coli suggests the hypothesis that the mechanisms of UV mutation formation are similar in these two organisms. (author)

An elastic-plastic contact model for line contact structures

Science.gov (United States)

Zhu, Haibin; Zhao, Yingtao; He, Zhifeng; Zhang, Ruinan; Ma, Shaopeng

2018-06-01

Although numerical simulation tools are now very powerful, the development of analytical models is very important for the prediction of the mechanical behaviour of line contact structures for deeply understanding contact problems and engineering applications. For the line contact structures widely used in the engineering field, few analytical models are available for predicting the mechanical behaviour when the structures deform plastically, as the classic Hertz's theory would be invalid. Thus, the present study proposed an elastic-plastic model for line contact structures based on the understanding of the yield mechanism. A mathematical expression describing the global relationship between load history and contact width evolution of line contact structures was obtained. The proposed model was verified through an actual line contact test and a corresponding numerical simulation. The results confirmed that this model can be used to accurately predict the elastic-plastic mechanical behaviour of a line contact structure.

Analysis of Photosynthetic Characteristics and UV-B Absorbing Compounds in Mung Bean Using UV-B and Red LED Radiation

Directory of Open Access Journals (Sweden)

Fang-Min Li

2014-01-01

Full Text Available Mung bean has been reported to have antioxidant, antidiabetic, anti-inflammatory, and antitumor activities. Various factors have important effects on the types and contents of plant chemical components. In order to study quality of mung bean from different light sources, mung bean seedlings were exposed to red light-emitting diodes (LEDs and ultraviolet-B (UV-B. Changes in the growth parameters, photosynthetic characteristics, the concentrations of chlorophyll a and chlorophyll b and the content of UV-B absorbing compounds were measured. The results showed that photosynthetic characteristics and chlorophyll a and chlorophyll b concentrations were enhanced by red LEDs. The concentrations of UV-B absorbing compounds were enhanced by UV-B on the 20th day, while photosynthetic characteristics, plant length, and the concentrations of chlorophyll a and chlorophyll b were reduced by UV-B on the 40th day; at the same time the values of the stem diameter, plant fresh weight, dry weight, and the concentrations of UV-B absorbing compounds were enhanced. It is suggested that red LEDs promote the elongation of plant root growth and photosynthetic characteristics, while UV-B promotes horizontal growth of stems and the synthesis of UV-B absorbing compounds.

Alfalfa seedlings grown outdoors are more resistant to UV-induced DNA damage than plants grown in a UV-free environmental chamber

International Nuclear Information System (INIS)

Takayanagi, Shinnosuke; Trunk, J.G.; Sutherland, J.C.; Sutherland, B.M.

1994-01-01

The relative UV sensitivities of alfalfa seedlings grown outdoors versus plants grown in a growth chamber under UV-filtered cool white fluorescent bulbs have been determined using three criteria: (1) level of endogenous DNA damage as sites for the UV endonuclease from Micrococcus luteus, (2) susceptibility to pyrimidine dimer induction by a UV challenge exposure and (3) ability to repair UV-induced damage. We find that outdoor-grown plants contain approximately equal frequencies of endogenous DNA damages, are less susceptible to dimer induction by a challenge exposure of broad-spectrum UV and photorepair dimers more rapidly than plants grown in an environmental chamber under cool white fluorescent lamps plus a filter removes most UV radiation. These data suggest that plants grown in a natural environment would be less sensitive to UVB-induced damage than would be predicted on the basis of studies on plants grown under minimum UV. (author)

Development of a low cost UV index datalogger and comparison between UV index sensors

Science.gov (United States)

Gomes, L. M.; Ventura, L.

2018-02-01

Ultraviolet radiation (UVR) is the part of radiation emitted by the Sun, with range between 280 nm and 400 nm, and that reaches the Earth's surface. The UV rays are essential to the human because it stimulates the production of vitamin D but this radiation may be related to several health problems, including skin cancer and ocular diseases like pterygium, photokeratitis, cataract and more. To inform people about UV radiation, it is adopted the Ultraviolet Index (UVI). This UVI consists in a measure of solar UV radiation level, which contributes to cause sunburn on skin, also known as Erythema, and is indicated as an integer number between 1 and 14, associated to categories from low to extreme respectively. The aim of this work was to develop a low cost UVI datalogger capable of measuring three different UVI sensors simultaneously, record their data with timestamp and serve the measures online through a dedicated server, so general public can access their data and see the current UV radiation conditions. We also compared three different UVI sensors (SGlux UV cosine, Skye SKU440 and SiLabs SI1145) between them and with meteorological models during a period of months to verify their compliance. With five months data, we could verify the sensors working characteristics and decide which among them are the most suitable for research purposes.

A UV-resistant mutant without an increased repair synthesis activity, established from a UV-sensitive human clonal cell line

International Nuclear Information System (INIS)

Suzuki, N.

1984-01-01

When cells of a human clonal cell line, RSa, with high sensitivity to UV lethality, were treated with the mutagen, ethyl methanesulfonate, a variant cell strain, UVr-1, was established as a mutant resistant to 254-nm far-ultraviolet radiation (UV). Cell proliferation studies showed that UVr-1 cells survived and actively proliferated at doses of UV-irradiation that greatly suppressed the proliferation of RSa cells. Colony-formation assays also confirmed the increased resistance of UVr-1 cells to UV. The recovery from a UV-induced inhibition in DNA synthesis, as [methyl- 3 H]thymidine uptake into cellular DNA, was more pronounced in UVr-1 cells than in RSa cells. Nevertheless, there was no significant difference in the activity of UV-induced DNA repair synthesis in either cell line, as estimated by the extent of unscheduled DNA synthesis and DNA repair replication. These characteristics of UVr-1 cells are discussed in the light of a previously reported UV-resistant variant, UVr-10, which had an increased DNA repair synthesis activity. (Auth.)

Equilibrium contact angle or the most-stable contact angle?

Science.gov (United States)

Montes Ruiz-Cabello, F J; Rodríguez-Valverde, M A; Cabrerizo-Vílchez, M A

2014-04-01

It is well-established that the equilibrium contact angle in a thermodynamic framework is an "unattainable" contact angle. Instead, the most-stable contact angle obtained from mechanical stimuli of the system is indeed experimentally accessible. Monitoring the susceptibility of a sessile drop to a mechanical stimulus enables to identify the most stable drop configuration within the practical range of contact angle hysteresis. Two different stimuli may be used with sessile drops: mechanical vibration and tilting. The most stable drop against vibration should reveal the changeless contact angle but against the gravity force, it should reveal the highest resistance to slide down. After the corresponding mechanical stimulus, once the excited drop configuration is examined, the focus will be on the contact angle of the initial drop configuration. This methodology needs to map significantly the static drop configurations with different stable contact angles. The most-stable contact angle, together with the advancing and receding contact angles, completes the description of physically realizable configurations of a solid-liquid system. Since the most-stable contact angle is energetically significant, it may be used in the Wenzel, Cassie or Cassie-Baxter equations accordingly or for the surface energy evaluation. © 2013 Elsevier B.V. All rights reserved.

Direct UV-writing of waveguides

DEFF Research Database (Denmark)

Færch, Kjartan Ullitz

2003-01-01

induced refractive index change of more than 10-2 have been obtained. New insight, with respect to understanding the UV induced index change obtained by direct UV writing, has been provided, through experiments conducted with such high-pressure loaded germanosilica samples. This include measurements...

Benchmark studies of UV-vis spectra simulation for cinnamates with UV filter profile.

Science.gov (United States)

Garcia, Ricardo D'A; Maltarollo, Vinícius G; Honório, Káthia M; Trossini, Gustavo H G

2015-06-01

Skin cancer is a serious public health problem worldwide, being incident over all five continents and affecting an increasing number of people. As sunscreens are considered an important preventive measure, studies to develop better and safer sunscreens are crucial. Cinnamates are UVB filters with good efficiency and cost-benefit, therefore, their study could lead to the development of new UV filters. A benchmark to define the most suitable density functional theory (DFT) functional to predict UV-vis spectra for ethylhexyl methoxycinnamate was performed. Time-dependent DFT (TD-DFT) calculations were then carried out [B3LYP/6-311 + G(d,p) and B3P86/6-311 + G(d,p) in methanol environment] for seven cinammete derivatives implemented in the Gaussian 03 package. All DFT/TD-DFT simulations were performed after a conformational search with the Monte-Carlo method and MMFF94 force field. B3LYP and B3P86 functionals were better at reproducing closely the experimental spectra of ethylhexyl methoxycinnamate. Calculations of seven cinnamates showed a λmax of around 310 nm, corroborating literature reports. It was observed that the energy for the main electronic transition was around 3.95 eV and could be explained by electron delocalization on the aromatic ring and ester group, which is important to UV absorption. The methodology employed proved to be suitable for determination of the UV spectra of cinnamates and could be used as a tool for the development of novel UV filters.

Light Conversion and Scattering in UV Protective Textiles

Directory of Open Access Journals (Sweden)

Grancarić Ana Marija

2014-12-01

Full Text Available The primary cause of skin cancer is believed to be a long exposure to solar ultraviolet radiation (UV-R crossed with the amount of skin pigmentation in the population. It is believed that in childhood and adolescence 80% of UV-R gets absorbed, whilst in the remaining 20% gets absorbed later in the lifetime. This suggests that proper and early photoprotection may reduce the risk of subsequent occurrence of skin cancer. Textile and clothing are the most suitable interface between environment and human body. It can show UV protection, but in most cases it does not provide full sun screening properties. UV protection ability highly depends on large number of factors such as type of fibre, fabric surface and construction, type and concentration of dyestuff, fluorescent whitening agent (FWA, UV-B protective agents, as well as nanoparticles, if applied. Based on electronically excited state by energy of UV-R (usually 340-370 nm, the molecules of FWAs show the phenomenon of fluorescence giving to white textiles high whiteness of outstanding brightness by reemitting the energy at the blue region (typically 420-470 nm of the spectrum. By absorbing UV-A radiation, optical brightened fabrics transform this radiation into blue fluorescence, which leads to better UV protection. Natural zeolites are rock-forming, microporous silicate minerals. Applied as nanoparticles to textile surface, it scatters the UV-R resulting in lower UV-A and UV-B transmission. If applied with other UV absorbing agents, e.g. FWAs, synergistic effect occurs. Silicones are inert, synthetic compounds with a variety of forms and uses. It provides a unique soft touch, is very resistant to washing and improves the property of fabric to protect against UV radiation. Therefore, the UV protective properties of cotton fabric achieved by light conversion and scattering was researched in this paper. For that purpose, the stilbene-derived FWAs were applied on cotton fabric in wide concentration

Mutational synergism between p-fluorophenylalaline and UV in Coprinus lagopus

International Nuclear Information System (INIS)

Talmud, P.J.

1977-01-01

The amino acid analogue p-fluorophenylalanine (PFP) is mutagenic to Coprinus lagopus due to its incorporation into proteins. Spontaneous mutations, PFP and UV mutagenesis and PFP/UV synergism have been studied in a UV resistant strain and in two complementing UV sensitive mutant strains. By comparison to the UV resistant strain, one UV sensitive strain shows normal spontaneous mutations, 1.4% PFP-induced mutations and 50-fold UV mutagenesis. The second UV sensitive strain has 19-fold spontaneous mutation frequency and slightly elevated UV mutagenesis. In all 3 strains the PFP/UV synergism is comparable (4-5 times the arithmetic expected). The results indicate that PFP mutagenesis is due to the incorporation of PFP into enzymes normally functioning in the organism but which also participate in UV repair mechanisms. A model is proposed for UV repair which is based on a PFP sensitive excision repair system of at least two enzymes, an alternative 'error-proof' pathway which is not susceptible to PFP and an 'error-prone' pathway which is responsible for UV mutagenesis and is susceptible to PFP as shown by the PFP/UV synergism. Because PFP is given before UV treatment, this implies a UV inducible cofactor and a PFP sensitive enzyme which only functions after UV activation

Growth, photosynthesis and nitrogen metabolism in soybean varieties after exclusion of the UV-B and UV-A/B components of solar radiation

Directory of Open Access Journals (Sweden)

Sanjay Singh Baroniya

2014-12-01

Full Text Available A field experiment was conducted to study the impact of the exclusion of the solar UV components on growth, photosynthesis and nitrogen metabolism in soybean (Glycine max varieties PK-472, Pusa-24, JS 71-05, JS-335, NRC-7 and Kalitur. The plants were grown in specially designed UV exclusion chambers wrapped with filters to exclude UV-B or UV-A/B and transmitted all UV. Exclusion of UV significantly enhanced the growth of the aerial parts as well as the growth of the below ground parts in all of the six soybean varieties. Nitrate reductase activity (NRA was significantly reduced, whereas leghemoglobin (Lb content, total soluble protein, net photosynthesis (Pn and α-tocopherol content were enhanced after UV exclusion. The exclusion of solar UV-A/B enhanced all parameters to a larger extent than the exclusion of solar UV-B in four of the six varieties of soybean except for NRC-7 and Kalitur. These two varieties responded more to UV-B exclusion compared to UV-A/B exclusion. A significant inverse correlation between the NRA and the number of nodules per plant was observed. The extent of response in all parameters was greater in PK-472 and JS71-05 than that in Kalitur and JS-335 after UV exclusion. The exclusion of UV augmented the growth of nodules, Lb content and α-tocopherol levels and conferred higher rates of Pn to support better growth of nodules. Control plants (+ UV-A/B seemed to fulfill their N demand through the assimilation of NO3− resulting in lower symbiotic nitrogen fixation and higher NR activity.

Development of UV absorbing PET through Electron Irradiation

International Nuclear Information System (INIS)

Kim, Jung Woo; Lee, Na Eun; Lim, Hyung San; Park, Yang Jeong; Cho, Sung Oh

2017-01-01

Experiment to increase UV absorbance through electron beam irradiation on PET was performed. Moreover, surface hardness and roughness of each sample were observed to find the key factor increasing UV absorbance. PET sheets were irradiated with an electron beam at various fluences. The irradiated samples, as well as pristine sample, were subjected to UV-visible spectral study(UV-Vis), pencil hardness test, and scanning electron microscopy(SEM) experiment. In this study, PET samples irradiated at several conditions were analyzed through various measurements. UV absorbance-another meaning of transmittance in this study- of irradiated PET sample increased compared with pristine sample as fluence was increased in UV-Visible spectroscopy experiment.

Long-term variations of the UV-B radiation over Central Europe as derived from the reconstructed UV time series

Directory of Open Access Journals (Sweden)

J. W. Krzyscin

2004-04-01

Full Text Available The daily doses of the erythemally weighted UV radiation are reconstructed for three sites in Central Europe: Belsk-Poland (1966–2001, Hradec Kralove-Czech Republic (1964–2001, and Tõravere-Estonia (1967–2001 to discuss the UV climatology and the long-term changes of the UV-B radiation since the mid 1960s. Various reconstruction models are examined: a purely statistical model based on the Multivariate Adaptive Regression Splines (MARS methodology, and a hybrid model combining radiative transfer model calculations with empirical estimates of the cloud effects on the UV radiation. Modeled long-term variations of the surface UV doses appear to be in a reasonable agreement with the observed ones. A simple quality control procedure is proposed to check the homogeneity of the biometer and pyranometer data. The models are verified using the results of UV observations carried out at Belsk since 1976. MARS provides the best estimates of the UV doses, giving a mean difference between the modeled and observed monthly means equal to 0.6±2.5%. The basic findings are: similar climatological forcing by clouds for all considered stations (~30% reduction in the surface UV, long-term variations in UV monthly doses having the same temporal pattern for all stations with extreme low monthly values (~5% below overall mean level at the end of the 1970s and extreme high monthly values (~5% above overall mean level in the mid 1990s, regional peculiarities in the cloud long-term forcing sometimes leading to extended periods with elevated UV doses, recent stabilization of the ozone induced UV long-term changes being a response to a trendless tendency of total ozone since the mid 1990s. In the case of the slowdown of the total ozone trend over Northern Hemisphere mid-latitudes it seems that clouds will appear as the most important modulator of the UV radiation both in long- and short-time scales over next decades. Key words. Atmospheric composition and structure

Long-term variations of the UV-B radiation over Central Europe as derived from the reconstructed UV time series

Directory of Open Access Journals (Sweden)

J. W. Krzyscin

2004-04-01

Full Text Available The daily doses of the erythemally weighted UV radiation are reconstructed for three sites in Central Europe: Belsk-Poland (1966–2001, Hradec Kralove-Czech Republic (1964–2001, and Tõravere-Estonia (1967–2001 to discuss the UV climatology and the long-term changes of the UV-B radiation since the mid 1960s. Various reconstruction models are examined: a purely statistical model based on the Multivariate Adaptive Regression Splines (MARS methodology, and a hybrid model combining radiative transfer model calculations with empirical estimates of the cloud effects on the UV radiation. Modeled long-term variations of the surface UV doses appear to be in a reasonable agreement with the observed ones. A simple quality control procedure is proposed to check the homogeneity of the biometer and pyranometer data. The models are verified using the results of UV observations carried out at Belsk since 1976. MARS provides the best estimates of the UV doses, giving a mean difference between the modeled and observed monthly means equal to 0.6±2.5%. The basic findings are: similar climatological forcing by clouds for all considered stations (~30% reduction in the surface UV, long-term variations in UV monthly doses having the same temporal pattern for all stations with extreme low monthly values (~5% below overall mean level at the end of the 1970s and extreme high monthly values (~5% above overall mean level in the mid 1990s, regional peculiarities in the cloud long-term forcing sometimes leading to extended periods with elevated UV doses, recent stabilization of the ozone induced UV long-term changes being a response to a trendless tendency of total ozone since the mid 1990s. In the case of the slowdown of the total ozone trend over Northern Hemisphere mid-latitudes it seems that clouds will appear as the most important modulator of the UV radiation both in long- and short-time scales over next decades.

Key words. Atmospheric composition and

Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:H

Energy Technology Data Exchange (ETDEWEB)

Molpeceres, C. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain)], E-mail: carlos.molpeceres@upm.es; Lauzurica, S.; Garcia-Ballesteros, J.J.; Morales, M.; Guadano, G.; Ocana, J.L. [Centro Laser UPM, Univ. Politecnica de Madrid, Crta. de Valencia Km 7.3, 28031 Madrid (Spain); Fernandez, S.; Gandia, J.J. [Dept. de Energias Renovables, Energia Solar Fotovoltaica, CIEMAT, Avda, Complutense 22, 28040 Madrid (Spain); Villar, F.; Nos, O.; Bertomeu, J. [CeRMAE Dept. Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, 08028 Barcelona (Spain)

2009-03-15

Lasers are essential tools for cell isolation and monolithic interconnection in thin-film-silicon photovoltaic technologies. Laser ablation of transparent conductive oxides (TCOs), amorphous silicon structures and back contact removal are standard processes in industry for monolithic device interconnection. However, material ablation with minimum debris and small heat affected zone is one of the main difficulty is to achieve, to reduce costs and to improve device efficiency. In this paper we present recent results in laser ablation of photovoltaic materials using excimer and UV wavelengths of diode-pumped solid-state (DPSS) laser sources. We discuss results concerning UV ablation of different TCO and thin-film silicon (a-Si:H and nc-Si:H), focussing our study on ablation threshold measurements and process-quality assessment using advanced optical microscopy techniques. In that way we show the advantages of using UV wavelengths for minimizing the characteristic material thermal affection of laser irradiation in the ns regime at higher wavelengths. Additionally we include preliminary results of selective ablation of film on film structures irradiating from the film side (direct writing configuration) including the problem of selective ablation of ZnO films on a-Si:H layers. In that way we demonstrate the potential use of UV wavelengths of fully commercial laser sources as an alternative to standard backscribing process in device fabrication.

Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:H

International Nuclear Information System (INIS)

Molpeceres, C.; Lauzurica, S.; Garcia-Ballesteros, J.J.; Morales, M.; Guadano, G.; Ocana, J.L.; Fernandez, S.; Gandia, J.J.; Villar, F.; Nos, O.; Bertomeu, J.

2009-01-01

Lasers are essential tools for cell isolation and monolithic interconnection in thin-film-silicon photovoltaic technologies. Laser ablation of transparent conductive oxides (TCOs), amorphous silicon structures and back contact removal are standard processes in industry for monolithic device interconnection. However, material ablation with minimum debris and small heat affected zone is one of the main difficulty is to achieve, to reduce costs and to improve device efficiency. In this paper we present recent results in laser ablation of photovoltaic materials using excimer and UV wavelengths of diode-pumped solid-state (DPSS) laser sources. We discuss results concerning UV ablation of different TCO and thin-film silicon (a-Si:H and nc-Si:H), focussing our study on ablation threshold measurements and process-quality assessment using advanced optical microscopy techniques. In that way we show the advantages of using UV wavelengths for minimizing the characteristic material thermal affection of laser irradiation in the ns regime at higher wavelengths. Additionally we include preliminary results of selective ablation of film on film structures irradiating from the film side (direct writing configuration) including the problem of selective ablation of ZnO films on a-Si:H layers. In that way we demonstrate the potential use of UV wavelengths of fully commercial laser sources as an alternative to standard backscribing process in device fabrication.

Capillary electrophoresis hyphenated with UV-native-laser induced fluorescence detection (CE/UV-native-LIF).

Science.gov (United States)

Couderc, François; Ong-Meang, Varravaddheay; Poinsot, Véréna

2017-01-01

Native laser-induced fluorescence using UV lasers associated to CE offers now a large related literature, for now 30 years. The main works have been performed using very expensive Ar-ion lasers emitting at 257 and 275 nm. They are not affordable for routine analyses, but have numerous applications such as protein, catecholamine, and indolamine analysis. Some other lasers such as HeCd 325 nm have been used but only for few applications. Diode lasers, emitting at 266 nm, cheaper, are extensively used for the same topics, even if the obtained sensitivity is lower than the one observed using the costly UV-Ar-ion lasers. This review presents various CE or microchips applications and different UV lasers used for the excitation of native fluorescence. We showed that CE/Native UV laser induced fluorescence detection is very sensitive for detection as well as small aromatic biomolecules than proteins containing Trp and Tyr amino acids. Moreover, it is a simple way to analyze biomolecules without derivatization. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Effects of plasma treatment on the Ohmic characteristics of Ti/Al/Ti/Au contacts to n-AlGaN

International Nuclear Information System (INIS)

Cao, X. A.; Piao, H.; LeBoeuf, S. F.; Li, J.; Lin, J. Y.; Jiang, H. X.

2006-01-01

The effects of surface treatment using Cl 2 /BCl 3 and Ar inductive coupled plasmas on the Ohmic characteristics of Ti/Al/Ti/Au contacts to n-type Al x Ga 1-x N (x=0-0.5) were investigated. Plasma treatment significantly increased the surface conductivity of GaN and Al 0.1 Ga 0.9 N, leading to improved Ohmic behaviors of the contacts. However, it reduced the surface doping level in Al x Ga 1-x N (x≥0.3) and degraded the contact properties. Following a 900-1000 deg. C anneal, the Ti/Al/Ti/Au contacts to Al x Ga 1-x N (x=0-0.3) became truly Ohmic, with specific contact resistances of (3-7)x10 -5 Ω cm 2 , whereas the contact to Al 0.5 Ga 0.5 N remained rectifying even without the plasma treatment. X-ray photoelectron spectroscopy measurements confirmed that the Fermi level moved toward the conduction band in GaN after the plasma treatment, but it was pinned by plasma-induced deep-level states in Al 0.5 Ga 0.5 N. This study emphasizes the need to mitigate plasma damage introduced during the mesa etch step for AlGaN-based deep-UV emitters and detectors

UV Tanning Equipment | Radiation Protection | US EPA

Science.gov (United States)

2017-08-07

Sun lamps and tanning equipment emit ultraviolet (UV) rays. People who are exposed to UV rays over a long period of time are more likely to develop skin cancer. People with light skin are in more danger because their skin is more sensitive to UV rays.

Degradation of m-dihydroxybenzene by contact glow discharge electrolysis in aqueous

International Nuclear Information System (INIS)

Gai, Ke; Qi, Huili; Ma, Dongping; Wang, Chunlin

2013-01-01

This paper reported the degradation of m-dihydroxybenzene aqueous solution with contact Glow Discharge Electrolysis. The rate of degradation in different conditions such as pH, H 2 O 2 , Fe 2+ , methanol, and other affecting factors were studied. The results showed that there is faster removal rate when the solution is in a relatively higher acidity; H 2 O 2 can improve the efficiency rate. Fe 2+ can promote reaction, but radical elimination agent of methanol will decrease the rate of the reaction. On the basis of analyzing the ultraviolet (UV) spectra of the solution and the intermediate products from High Performance Liquid Chromatography-Mass Spectrum (HPLC-MS), reaction pathway was proposed.

Numerical and experimental investigation of UV disinfection for water treatment

International Nuclear Information System (INIS)

Li, H.Y.; Osman, H.; Kang, C.W.; Ba, T.

2017-01-01

Highlights: • UV irradiation for water treatment is numerically and experimentally investigated. • Fluence rate E increases exponentially with the increase of UVT. • UV dose distribution moves to a high range with increase of UVT and lamp power. • A linear relationship is observed between fluence rate E and average UV dose D_a_v_e. • D_a_v_e decreases with the increase of UVT and fluid flow rate. - Abstract: Disinfection by ultraviolet (UV) for water treatment in a UV reactor is numerically and experimentally investigated in this paper. The flow of water, UV radiation transportation as well as microorganism particle trajectories in the UV reactor is simulated. The effects of different parameters including UV transmittance (UVT), lamp power and water flow rate on the UV dose distribution and average UV dose are studied. The UV reactor performance in terms of average UV dose under these parameters is analysed. Comparisons are made between experiments and simulations on the average UV dose and reasonable agreement is achieved. The results show that the fluence rate increases exponentially with the increase of UVT. The UV dose distribution profiles moves to a high range of UV dose with the increase of UVT and lamp power. The increase of water flow rate reduces the average exposure time of microorganism particles to the UV light, resulting in the shifting of UV dose distribution to a low range of UV dose. A linear relationship is observed between fluence rate and the average UV dose. The average UV dose increases with the increase of lamp power while it decreases with the increase of UVT and water flow rate.

Study of mechanical behavior of PMMA in bending and after UV irradiation and gamma radiation

International Nuclear Information System (INIS)

Todt, M.L.; Kienen, V.D.; Azevedo, E.C.

2014-01-01

PMMA is a polymer that has density similar to water and refractive index alike to glass. It has been used in the substitution to roofing tiles and coverages, affording to be exposed to UV radiation and gamma radiation. This paper had the objective to study the effect in the flexural proprieties of the PMMA exposed to these types of radiations and the evaluation of the wettability through a contact angle measurer. The PMMA specimens have been submitted to 1500 h of UVA radiation, 1500 h of UVC radiation and to 25kGy of gamma radiation. The results show that the PMMA. (author)

Ciprofloxacin oxidation by UV-C activated peroxymonosulfate in wastewater

International Nuclear Information System (INIS)

Mahdi-Ahmed, Moussa; Chiron, Serge

2014-01-01

Highlights: • UV/PMS more efficient than UV/H 2 O 2 for ciprofloxacin removal in wastewater. • PMS decomposition into sulfate radical was activated by bicarbonate ions. • CIP degradation pathways elucidation support sulfate radical attacks as a main route. • Sulfate radical generation allows for CIP antibacterial activity elimination. -- Abstract: This work aimed at demonstrating the advantages to use sulfate radical anion for eliminating ciprofloxacin residues from treated domestic wastewater by comparing three UV-254 nm based advanced oxidation processes: UV/persulfate (PDS), UV/peroxymonosulfate (PMS) and UV/H 2 O 2 . In distilled water, the order of efficiency was UV/PDS > UV/PMS > UV/H 2 O 2 while in wastewater, the most efficient process was UV/PMS followed by UV/PDS and UV/H 2 O 2 mainly because PMS decomposition into sulfate radical anion was activated by bicarbonate ions. CIP was fully degraded in wastewater at pH 7 in 60 min for a [PMS]/[CIP] molar ratio of 20. Nine transformation products were identified by liquid chromatography–high resolution-mass spectrometry allowing for the establishment of degradation pathways in the UV/PMS system. Sulfate radical anion attacks prompted transformations at the piperazinyl ring through a one electron oxidation mechanism as a major pathway while hydroxyl radical attacks were mainly responsible for quinolone moiety transformations as a minor pathway. Sulfate radical anion generation has made UV/PMS a kinetically effective process in removing ciprofloxacin from wastewater with the elimination of ciprofloxacin antibacterial activity

Ciprofloxacin oxidation by UV-C activated peroxymonosulfate in wastewater

Energy Technology Data Exchange (ETDEWEB)

Mahdi-Ahmed, Moussa; Chiron, Serge, E-mail: Serge.Chiron@msem.univ-montp2.fr

2014-01-30

Highlights: • UV/PMS more efficient than UV/H{sub 2}O{sub 2} for ciprofloxacin removal in wastewater. • PMS decomposition into sulfate radical was activated by bicarbonate ions. • CIP degradation pathways elucidation support sulfate radical attacks as a main route. • Sulfate radical generation allows for CIP antibacterial activity elimination. -- Abstract: This work aimed at demonstrating the advantages to use sulfate radical anion for eliminating ciprofloxacin residues from treated domestic wastewater by comparing three UV-254 nm based advanced oxidation processes: UV/persulfate (PDS), UV/peroxymonosulfate (PMS) and UV/H{sub 2}O{sub 2}. In distilled water, the order of efficiency was UV/PDS > UV/PMS > UV/H{sub 2}O{sub 2} while in wastewater, the most efficient process was UV/PMS followed by UV/PDS and UV/H{sub 2}O{sub 2} mainly because PMS decomposition into sulfate radical anion was activated by bicarbonate ions. CIP was fully degraded in wastewater at pH 7 in 60 min for a [PMS]/[CIP] molar ratio of 20. Nine transformation products were identified by liquid chromatography–high resolution-mass spectrometry allowing for the establishment of degradation pathways in the UV/PMS system. Sulfate radical anion attacks prompted transformations at the piperazinyl ring through a one electron oxidation mechanism as a major pathway while hydroxyl radical attacks were mainly responsible for quinolone moiety transformations as a minor pathway. Sulfate radical anion generation has made UV/PMS a kinetically effective process in removing ciprofloxacin from wastewater with the elimination of ciprofloxacin antibacterial activity.

Complementary UV-Absorption of Mycosporine-like Amino Acids and Scytonemin is Responsible for the UV-Insensitivity of Photosynthesis in Nostoc flagelliforme

Science.gov (United States)

Ferroni, Lorenzo; Klisch, Manfred; Pancaldi, Simonetta; Häder, Donat-Peter

2010-01-01

Mycosporine-like amino acids (MAAs) and scytonemin are UV-screening compounds that have presumably appeared early in the history of life and are widespread in cyanobacteria. Natural colonies of the UV-insensitive Nostoc flagelliforme were found to be especially rich in MAAs (32.1 mg g DW−1), concentrated in the glycan sheath together with scytonemin. MAAs are present in the form of oligosaccharide-linked molecules. Photosystem II activity, measured using PAM fluorescence and oxygen evolution, was used as a most sensitive physiological parameter to analyse the effectiveness of UV-protection. Laboratory experiments were performed under controlled conditions with a simulated solar radiation specifically deprived of UV-wavebands with cut-off filters (295, 305, 320, 345 and 395 nm). The UV-insensitivity of N. flagelliforme was found to cover the whole UV-A (315–400 nm) and UV-B (280–320 nm) range and is almost certainly due to the complementary UV-absorption of MAAs and scytonemin. The experimental approach used is proposed to be suitable for the comparison of the UV-protection ability in organisms that differ in their complement of UV-sunscreen compounds. Furthermore, this study performed with a genuinely terrestrial organism points to the relevance of marine photoprotective compounds for life on Earth, especially for the colonization of terrestrial environments. PMID:20161974

Complementary UV-Absorption of Mycosporine-like Amino Acids and Scytonemin is Responsible for the UV-Insensitivity of Photosynthesis in Nostoc flagelliforme

Directory of Open Access Journals (Sweden)

Donat-Peter Häder

2010-01-01

Full Text Available Mycosporine-like amino acids (MAAs and scytonemin are UV-screening compounds that have presumably appeared early in the history of life and are widespread in cyanobacteria. Natural colonies of the UV-insensitive Nostoc flagelliforme were found to be especially rich in MAAs (32.1 mg g DW-1, concentrated in the glycan sheath together with scytonemin. MAAs are present in the form of oligosaccharide-linked molecules. Photosystem II activity, measured using PAM fluorescence and oxygen evolution, was used as a most sensitive physiological parameter to analyse the effectiveness of UV-protection. Laboratory experiments were performed under controlled conditions with a simulated solar radiation specifically deprived of UV-wavebands with cut-off filters (295, 305, 320, 345 and 395 nm. The UV-insensitivity of N. flagelliforme was found to cover the whole UV-A (315–400 nm and UV-B (280–320 nm range and is almost certainly due to the complementary UV-absorption of MAAs and scytonemin. The experimental approach used is proposed to be suitable for the comparison of the UV-protection ability in organisms that differ in their complement of UV-sunscreen compounds. Furthermore, this study performed with a genuinely terrestrial organism points to the relevance of marine photoprotective compounds for life on Earth, especially for the colonization of terrestrial environments.

Effect of uv irradiation on lambda DNA transcription

Energy Technology Data Exchange (ETDEWEB)

Ranade, S S [Cancer Research Inst., Bombay (India)

1977-05-01

The effect of uv irradiation of template DNA has been studied in vitro in the E.coli RNA polymerase system with native and uv treated lambda DNA. Lambda DNA was more susceptible to uv than was calf-thymus DNA, yet a residual activity was observed at a uv dose of 0.5 x 10/sup 4/ erg/mm/sup 2/. From the kinetic analysis of the reaction and the incorporation of lambda /sup 32/P-labelled nucleoside triphosphates, it seems reasonable to conclude that uv irradiation probably did not affect the DNA initiation sites, recognizable by RNA polymerase. The transcription products made with uv irradiated lambda DNA were asymmetrical, and hybridized to the right half (R) and the left half (L) of lambda DNA with the ratio of R/L=4/1, and they showed a lower hybridizability than the transcripts with native lambda DNA. The initiation sites recognizable by RNA polymerase seemed to be the same on both native and uv irradiated lambda DNA, though the transcription of uv treated lambda DNA appeared to terminate with rather short RNA chains.