WorldWideScience

Sample records for closed-field dual magnetron

  1. CARBON NITRIDE FILMS PREPARED AT DIFFERENT N2/Ar RATIOS BY CLOSED FIELD UNBALANCED REACTIVE MAGNETRON SPUTTERING

    Institute of Scientific and Technical Information of China (English)

    A. Vyas; K.Y. Li; Z.F. Zhou; Y.G. Shen

    2005-01-01

    Carbon nitride (CNx) thin films have been deposited onto Si(100) (for structural and mechanical analyses) and M42 high-speed-steel (for tribological measurements) substrates at room temperature by closed-field unbalanced magnetron sputtering. The mechanical and tribological properties of these films were highly dependent on the N/C concentration ratio that was adjusted by the F(N2)/F(Ar) flow-rate ratio at fixed substrate biasing of -60V during deposition. The films were characterized by employing scanning electron microscopy (SEM), atomic force microscopy(AFM), nano-indentation measurements, X-ray photoelectron spectroscopy (XPS), Raman scattering and Fourier transform infrared (FTIR) spectroscopy, pin-on-disc tribometer, scratch tester, and Rockwell-C tester. The results showed that the N content in the films increased with the N2 pressure. However, the maximum N/C ratio obtained was 0.25. The nanohardness was measured to be in the range of 11.7-20.8GPa depending on the N/C ratios. The XPS N 1s spectra showed the existence of both N-C sp2 and N-C sp3 bonds in films. Raman and FTIR spectra exhibited that N-C bonds were fewer when compared to other N-C bonds. The friction coefficient of the film deposited onto steel substrate with N/C=0.26 was measured to be ~0.08and for film with N/C=0.22 a high critical load of 70N was obtained. The tribological data also showed that the wear rates of these films were in the range of~10-16m3/Nm, indicating excellent wear resistance for CNxfilms.

  2. Surface free energy of non-stick coatings deposited using closed field unbalanced magnetron sputter ion plating

    Energy Technology Data Exchange (ETDEWEB)

    Sun, C.-C. [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China); Lee, S.-C. [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China); Dai, S.-B. [Center of General Studies, National Kaohsiung Marine University, Nan-Tzu, Kaohsiung, Taiwan (China); Nano-Win Technology Co. Ltd., Tainan, Taiwan (China); Tien, S.-L. [Department of Physics, National Cheng Kung University, 701 Tainan, Taiwan (China); Chang, C.-C. [Department of Physics, R.O.C. Military Academy, 830 Kaohsiung, Taiwan (China); Fu, Y.-S. [Department of Environment and Energy, National University of Tainan, Tainan, Taiwan (China)]. E-mail: ysfu@mail.nutn.edu.tw

    2007-02-15

    Semiconductor IC packaging molding dies require wear resistance, corrosion resistance and non-sticking (with a low surface free energy). The molding releasing capability and performance are directly associated with the surface free energy between the coating and product material. The serious sticking problem reduces productivity and reliability. Depositing TiN, TiMoS, ZrN, CrC, CrN, NiCr, NiCrN, CrTiAlN and CrNiTiAlN coatings using closed field unbalanced magnetron sputter ion plating, and characterizing their surface free energy are the main object in developing a non-stick coating system for semiconductor IC molding tools. The contact angle of water, diiodomethane and ethylene glycol on the coated surfaces were measured at temperature in 20 deg. C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the coatings and their components (dispersion and polar) were calculated using the Owens-Wendt geometric mean approach. The surface roughness was investigated by atomic force microscopy (AFM). The adhesion force of these coatings was measured using direct tensile pull-off test apparatus. The experimental results showed that NiCrN, CrN and NiCrTiAlN coatings outperformed TiN, ZrN, NiCr, CiTiAlN, CrC and TiMoS coatings in terms of non-sticking, and thus have the potential as working layers for injection molding industrial equipment, especially in semiconductor IC packaging molding applications.

  3. Studies of the composition, tribology and wetting behavior of silicon nitride films formed by pulsed reactive closed-field unbalanced magnetron sputtering

    Science.gov (United States)

    Yao, Zh. Q.; Yang, P.; Huang, N.; Wang, J.; Wen, F.; Leng, Y. X.

    2006-01-01

    Silicon nitride films were formed by pulsed reactive closed-field unbalanced magnetron sputtering of high purity Si targets in an Ar-N2 mixture. The effects of N2 fraction on the chemical composition, and tribological and wetting behaviors were investigated. The films deposited at a high N2 fraction were consistently N-rich. The surface microstructure changed from continuous granular surrounded by tiny void regions to a homogeneous and dense microstructure, and densitied as the N2 fraction is increased. The as-deposited films have a relatively low friction coefficient and better wear resistance than 316L stainless steel under dry sliding friction and experienced only abrasive wear. The decreased surface roughness and increased nitrogen incorporation in the film give rise to increased contact angle with double-stilled water from 24° to 49.6°. To some extent, the silicon nitride films deposited are hydrophilic in nature.

  4. Multilayered TiAlN films on Ti6Al4V alloy for biomedical applications by closed field unbalanced magnetron sputter ion plating process

    Energy Technology Data Exchange (ETDEWEB)

    Yi, Peiyun [State Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240 (China); Shanghai Key Laboratory of Digital Manufacture for Thin-walled Structures, Shanghai Jiao Tong University, Shanghai 200240 (China); Peng, Linfa, E-mail: penglinfa@sjtu.edu.cn [State Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240 (China); Shanghai Key Laboratory of Digital Manufacture for Thin-walled Structures, Shanghai Jiao Tong University, Shanghai 200240 (China); Huang, Jiaqiang [State Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240 (China)

    2016-02-01

    Ti6Al4V alloy has been widely used as a suitable material for surgical implants such as artificial hip joints. In this study, a series of multilayered gradient TiAlN coatings were deposited on Ti6Al4V substrate using closed field unbalanced magnetron sputter ion plating (CFUBMSIP) process. Taguchi design of experiment approach was used to reveal the influence of depositing parameters to the film composition and performance of TiAlN coatings. The phase structure and chemical composition of the TiAlN films were characterized by X-ray diffractometry (XRD) and X-ray photoelectron spectroscopy (XPS). Mechanical properties, including hardness, Young's modulus, friction coefficient, wear rate and adhesion strength were systematically evaluated. Potentiodynamic tests were conducted to evaluate the corrosion resistance of the coated samples in Ringer's solution at 37 °C to simulate human body environment. Comprehensive performance of TiAlN films was evaluated by assigning different weight according to the application environment. S8, deposited by Ti target current of 8 A, Al target current of 6 A, bias voltage of − 60 V and nitrogen content with OEM (optical emission monitor) value of 45%, was found to achieve best performance in orthogonal experiments. Depositing parameters of S8 might be practically applied for commercialization of surgical implants. - Highlights: • Multilayered TiAlN coatings were deposited on Ti6Al4V for biomedical applications. • The deposition method was closed field unbalanced magnetron sputter ion plating. • Influence of depositing parameters to film composition and performance was revealed. • Optimum process conditions was selected by orthogonal experiments.

  5. Multilayered TiAlN films on Ti6Al4V alloy for biomedical applications by closed field unbalanced magnetron sputter ion plating process.

    Science.gov (United States)

    Yi, Peiyun; Peng, Linfa; Huang, Jiaqiang

    2016-02-01

    Ti6Al4V alloy has been widely used as a suitable material for surgical implants such as artificial hip joints. In this study, a series of multilayered gradient TiAlN coatings were deposited on Ti6Al4V substrate using closed field unbalanced magnetron sputter ion plating (CFUBMSIP) process. Taguchi design of experiment approach was used to reveal the influence of depositing parameters to the film composition and performance of TiAlN coatings. The phase structure and chemical composition of the TiAlN films were characterized by X-ray diffractometry (XRD) and X-ray photoelectron spectroscopy (XPS). Mechanical properties, including hardness, Young's modulus, friction coefficient, wear rate and adhesion strength were systematically evaluated. Potentiodynamic tests were conducted to evaluate the corrosion resistance of the coated samples in Ringer's solution at 37°C to simulate human body environment. Comprehensive performance of TiAlN films was evaluated by assigning different weight according to the application environment. S8, deposited by Ti target current of 8A, Al target current of 6A, bias voltage of -60V and nitrogen content with OEM (optical emission monitor) value of 45%, was found to achieve best performance in orthogonal experiments. Depositing parameters of S8 might be practically applied for commercialization of surgical implants.

  6. TRIBOLOGICAL AND HIGH SPEED TURNING PERFORMANCE IN Ti1-xAlxN COATINGS PREPARED BY CLOSE-FIELD UNBALANCED MAGNETRON SPUTTERING

    Institute of Scientific and Technical Information of China (English)

    P.W. Shum; M. Escursell; T.H. Wong; K.Y. Li; Z.F. Zhou; Y.G. Shen

    2005-01-01

    Titanium-aluminium-nitride (Ti1-xAlxN) coatings were deposited by close-field unbalanced magnetron sputtering on M42 steel substrates and WC-6wt%Co inserts at 450℃. The tribological behavior was analyzed by sliding against steel and WC-6wt%Co balls, while the turning performance was evaluated by a conventional turning machine at high cutting speeds without using coolants. In the tribological tests, the formation of transfer layer and the variations of hardness of the coatings played an important role for sliding against steel balls. For the coatings sliding against WC-6wt%Co balls, the Ti-A1-N coatings showed a similar friction coefficient, but the TiN coating exhibited a lower value. The difference could be explained by the tri-oxidation wear mechanism. In the turning tests, a superior cutting performance of the coating was found at x=0.45, which endured 38 minutes before the tool flank wear reached the maximum value of 0.3mm, whereas only 20 minutes were endured for the TiN coating. The excellent performance of the coatings in the turning tests could be explained by the enhanced mechanical properties and oxidation/diffusion resistance of the coatings.

  7. The development of a nanostructured, graded multilayer Cr-CrxNy-Cr1-xAlxN coating produced by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) for use in aluminum pressure die casting dies.

    Science.gov (United States)

    Lin, Jianliang; Mishra, Brajendra; Myers, Sterling; Ried, Peter; Moore, John J

    2009-06-01

    The main objective of this research is to design an optimized 'coating system' that extends die life by minimizing premature die failure. The concept of the multilayer coating system with desired combinations of different kinds of single-layer coatings was introduced. A pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) deposition system has been used to deposit Cr-CrxNy-Cr1-xAlxN compositionally graded multilayer coating structures. In this study, three power law scenarios have been adopted to vary the aluminum concentration in the graded Cr1-xAlxN layer: (i) p = 1, the aluminum concentration was increased linearly in the Cr1-xAlxN layer. (ii) p = 0.2, the Cr1-xAlxN layer is an aluminum-rich graded layer, and (iii) p = 2, the Cr1-xAlxN layer is a chromium-rich graded layer. It was found that all the graded coatings exhibit lower residual stress and higher adhesion strength than the homogeneous Cr1-xAlxN (x = 0.585) film. However, different power law grading architectures have significant influence on the hardness and wear resistance of the films. When p = 2 and p = 1, the graded films exhibited relatively low hardness values (24 and 26 GPa respectively) and high COF (0.55 to 0.60). When p = 0.2 the graded film exhibited both high hardness (34 GPa) and good wear resistance (COF = 0.45) due to the structural consistency in the graded zone. The paper discusses the correlation between the pulsing parameters and coating architecture with the resulting nanostructure and tribological properties of this Cr-CrxNy-Cr1-xAlxN coating system.

  8. Properties of Diamond-Like Carbon Films Synthesized by Dual-Target Unbalanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    LIU Cui; LI Guo-Qing; GOU Wei; MU Zong-Xin; ZHANG Cheng-Wu

    2004-01-01

    @@ Smooth, dense and uniform diamond-like carbon films (DLC films) for industrial applications have successfully been prepared by dual-target unbalanced magnetron sputtering and the DLC characteristics of the films are confirmed by Raman spectra. It is found that the sputtering current of target plays an important role in the DLC film deposition. Deposition rate of 3.5μm/h is obtained by using the sputtering current of 30 A. The friction coefficient of the films is 0.2-0.225 measured by using a pin-on-disc microtribometer. The structure of the films tends to have a growth of sp3 bonds content at high sputtering current. The compressive residual stress in the films increases with the increasing sputtering current of the target.

  9. Effect of hafnium doping on density of states in dual-target magnetron co-sputtering HfZnSnO thin film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Huang, Chuan-Xin; Li, Jun, E-mail: SHUniverjunli@163.com; Fu, Yi-Zhou; Jiang, Xue-Yin [School of Material Science and Engineering, Shanghai University, Jiading, Shanghai 201800 (China); Zhang, Jian-Hua [Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072 (China); Zhang, Zhi-Lin [School of Material Science and Engineering, Shanghai University, Jiading, Shanghai 201800 (China); Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072 (China)

    2015-11-23

    This study investigates the effect of hafnium doping on the density of states (DOSs) in HfZnSnO thin film transistors fabricated by dual-target magnetron co-sputtering system. The DOSs is extracted by temperature-dependent field-effect measurements, and they decrease from 1.1 × 10{sup 17} to 4.6 × 10{sup 16 }eV/cm{sup 3} with increasing the hafnium concentrations. The behavior of DOSs for the increasing hafnium concentration HfZnSnO thin film transistors can be confirmed by both the reduction of ΔV{sub T} under bias stress and the trapping charges calculated by capacitance voltage measurements. It suggests that the reduction in DOSs due to the hafnium doping is closely related with the bias stability and thermal stability.

  10. Magnetron theory

    Science.gov (United States)

    Riyopoulos, Spilios

    1996-03-01

    A guiding center fluid theory is applied to model steady-state, single mode, high-power magnetron operation. A hub of uniform, prescribed density, feeds the current spokes. The spoke charge follows from the continuity equation and the incompressibility of the guiding center flow. Included are the spoke self-fields (DC and AC), obtained by an expansion around the unperturbed (zero-spoke charge) flow in powers of ν/V1, ν, and V1 being the effective charge density and AC amplitude. The spoke current is obtained as a nonlinear function of the detuning from the synchronous (Buneman-Hartree, BH) voltage Vs; the spoke charge is included in the self-consistent definition of Vs. It is shown that there is a DC voltage region of width ‖V-Vs‖˜V1, where the spoke width is constant and the spoke current is simply proportional to the AC voltage. The magnetron characteristic curves are ``flat'' in that range, and are approximated by a linear expansion around Vs. The derived formulas differ from earlier results [J. F. Hull, in Cross Field Microwave Devices, edited by E. Okress (Academic, New York, 1961), pp. 496-527] in (a) there is no current cutoff at synchronism; the tube operates well below as well above the BH voltage; (b) the characteristics are single valued within the synchronous voltage range; (c) the hub top is not treated as virtual cathode; and (d) the hub density is not equal to the Brillouin density; comparisons with tube measurements show the best agreement for hub density near half the Brillouin density. It is also shown that at low space charge and low power the gain curve is symmetric relative to the voltage (frequency) detuning. While symmetry is broken at high-power/high space charge magnetron operation, the BH voltage remains between the current cutoff voltages.

  11. Review of Magnetron Developments

    Science.gov (United States)

    Vyas, Sandeep Kumar; Verma, Rajendra Kumar; Maurya, Shivendra; Singh, V. V. P.

    2016-09-01

    Magnetrons have been the most efficient high power microwave sources for decades. In the twenty-first century, many of the development works are headed towards the performance improvement of CW industrial magnetrons. In this review article, the development works and techniques, used on different types of magnetrons, for the performance enhancement in the past two decades have been discussed. The article focuses on the state of the art of CW magnetron and the direction it will take in foreseeable future. In addition it also glimpses some of the major variants of magnetron which have further opened up scope in mm-THz spectrum of electromagnetism.

  12. De virtuele magnetron

    NARCIS (Netherlands)

    Luitjes, H.; Vollebregt, M.; Canters, R.

    2004-01-01

    De virtuele magnetron is computersoftware die de magentron nabootst. De virutele magnetron vereenvoudigt het ontwerpen van verpakkingen voor magnetronmaaltijden en is een hulpmiddel om het opwarmen van de diverse maaltijdcomponenten zodanig te verbeteren dat er minder koude en warme plaatsen in het

  13. De virtuele magnetron

    NARCIS (Netherlands)

    Luitjes, H.; Vollebregt, M.; Canters, R.

    2004-01-01

    De virtuele magnetron is computersoftware die de magentron nabootst. De virutele magnetron vereenvoudigt het ontwerpen van verpakkingen voor magnetronmaaltijden en is een hulpmiddel om het opwarmen van de diverse maaltijdcomponenten zodanig te verbeteren dat er minder koude en warme plaatsen in het

  14. Magnetron sputtering source

    Science.gov (United States)

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  15. Investigation of Texture and Residual Stresses in Reactive Magnetron Sputtered TiN coatings on M2 Steel Substrates

    Science.gov (United States)

    Mirchev, R.; Iordanova, I.; Antonov, V.; Kelly, P. J.

    2007-04-01

    The development of crystallographic texture and residual macro-stresses during the growth from 500 nm to 4000 nm of TiN films applied by reactive Closed Field Unbalanced Magnetron Sputtering (CFUBMS) on M2 tool steel at three direct target currents (Id) (namely 4, 6 and 8A) have been analyzed via X-ray diffraction.

  16. Theory of the magnetronic laser

    CERN Document Server

    Pardy, M

    2003-01-01

    We determine the total power of radiation of electron moving in the planar magnetron fields and the power spectrum generated by a single electron and by a system of N electrons moving coherently in the planar magnetron. We argue that for large N and high intensity of electric and magnetic fields, the power of radiation of such magnetronic laser, MAL, can be sufficient for application in the physical, chemical, biological and medicine sciences. In medicine, the magnetronic laser, can be used for the therapy of the localized cancer tumors. The application of MAL in CERN as an ion source for LHC is not excluded.

  17. Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

    OpenAIRE

    2014-01-01

    Fluorine doped tin oxide (FTO) coatings have been prepared using the mid-frequency pulsed DC closed field unbalanced magnetron sputtering technique in an Ar/O2 atmosphere using blends of tin oxide and tin fluoride powder formed into targets. FTO coatings were deposited with a thickness of 400 nm on glass substrates. No post-deposition annealing treatments were carried out. The effects of the chemical composition on the structural (phase, grain size), optical (transmission, optical band-gap) ...

  18. Variable Power, Short Microwave Pulses Generation using a CW Magnetron

    Directory of Open Access Journals (Sweden)

    CIUPA, R.

    2011-05-01

    Full Text Available Fine control of microwave power radiation in medical and scientific applications is a challenging task. Since a commercial Continuous Wave (CW magnetron is the most inexpensive microwave device available today on the market, it becomes the best candidate for a microwave power generator used in medical diathermy and hyperthermia treatments or high efficiency chemical reactions using microwave reactors as well. This article presents a new method for driving a CW magnetron with short pulses, using a modified commercial Zero Voltage Switching (ZVS inverter, software driven by a custom embedded system. The microwave power generator designed with this method can be programmed for output microwave pulses down to 1% of the magnetron's power and allows microwave low frequency pulse modulation in the range of human brain electrical activity, intended for medical applications. Microwave output power continuous control is also possible with the magnetron running in the oscillating area, using a dual frequency Pulse Width Modulation (PWM, where the low frequency PWM pulse is modulating a higher resonant frequency required by the ZVS inverter's transformer. The method presented allows a continuous control of both power and energy (duty-cycle at the inverter's output.

  19. Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

    Energy Technology Data Exchange (ETDEWEB)

    Stranak, V., E-mail: stranak@physik.uni-greifswald.de [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Wulff, H. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Rebl, H. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Zietz, C. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Arndt, K. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Bogdanowicz, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Nebe, B. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Bader, R. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Podbielski, A. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Hubicka, Z. [Academy of Sciences of the Czech Republic, Institute of Physics, Na Slovance 2, 180 00 Prague (Czech Republic); Hippler, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany)

    2011-10-10

    The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within the first 24 h the amount of Cu released from dual-HiPIMS films (about 250 {mu}g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated the killing of both bacteria using the Ti-Cu films prepared using the dual-HiPIMS technique. The killing effects on biofilm bacteria were less obvious. After the total release of copper from the Ti-Cu film the vitality of exposed human osteoblast MG-63 cells increased significantly. An initial cytotoxic effect followed by the growth of osteoblastic cells was demonstrated. The cytotoxic effect combined with growth of osteoblastic cells could be used in joint replacement surgery to reduce the possibility of infection and to increase adoption of the implants. Highlights: {yields} Ti-Cu films with significant cytotoxic effect were prepared by dual-HiPIMS technique. {yields} The cytotoxic effect is caused by total release of copper species from thin films. {yields} The copper release is influenced by crystallography and chemical properties of thin films. {yields} Sufficient growth of osteoblastic cells follows after copper release.

  20. Phase and Frequency Locked Magnetrons for SRF Sources

    Energy Technology Data Exchange (ETDEWEB)

    Neubauer, Michael [Muons, Inc.; Johnson, Rolland

    2014-09-12

    There is great potential for a magnetron power source that can be controlled both in phase and frequency. Such a power source could revolutionize many particle accelerator systems that require lower capital cost and/or higher power efficiency. Beyond the accelerator community, phase and frequency locked magnetons could improve radar systems around the world and make affordable phased arrays for wireless power transmission for solar powered satellites. This joint project of Muons, Inc., Fermilab, and L-3 CTL was supported by an STTR grant monitored by the Nuclear Physics Office of the DOE Office of Science. The object of the program was to incorporate ferrite materials into the anode of a magnetron and, with appropriate biasing of the ferrites, to maintain frequency lock and to allow for frequency adjustment of the magnetron without mechanical tuners. If successful, this device would have a dual use both as a source for SRF linacs and for military applications where fast tuning of the frequency is a requirement. In order to place the materials in the proper location, several attributes needed to be modeled. First the impact of the magnetron’s magnetic field needed to be shielded from the ferrites so that they were not saturated. And second, the magnetic field required to change the frequency of the magnetron at the ferrites needed to be shielded from the region containing the circulating electrons. ANSYS calculations of the magnetic field were used to optimize both of these parameters. Once the design for these elements was concluded, parts were fabricated and a complete test assembly built to confirm the predictions of the computer models. The ferrite material was also tested to determine its compatibility with magnetron tube processing temperatures. This required a vacuum bake out of the chosen material to determine the cleanliness of the material in terms of outgassing characteristics, and a subsequent room temperature test to verify that the characteristics of

  1. Electrons on closed field lines of lunar crustal fields in the solar wind wake

    Science.gov (United States)

    Nishino, Masaki N.; Saito, Yoshifumi; Tsunakawa, Hideo; Takahashi, Futoshi; Fujimoto, Masaki; Harada, Yuki; Yokota, Shoichiro; Matsushima, Masaki; Shibuya, Hidetoshi; Shimizu, Hisayoshi

    2015-04-01

    Plasma signature around crustal magnetic fields is one of the most important topics of the lunar plasma sciences. Although recent spacecraft measurements are revealing solar-wind interaction with the lunar crustal fields on the dayside, plasma signatures around crustal fields on the night side have not been fully studied yet. Here we show evidence of plasma trapping on the closed field lines of the lunar crustal fields in the solar-wind wake, using SELENE (Kaguya) plasma and magnetic field data obtained at 14-15 km altitude from the lunar surface. In contrast to expectation on plasma cavity formation at the strong crustal fields, electron flux is enhanced above Crisium Antipode (CA) anomaly which is one of the strongest lunar crustal fields. The enhanced electron fluxes above CA are characterised by (1) occasional bi-directional field-aligned beams in the lower energy range (<150 eV) and (2) a medium energy component (150-300 eV) that has a double loss-cone distribution representing bounce motion between the two footprints of the crustal magnetic fields. The low-energy electrons on the closed field lines may come from the lunar night side surface, while supply mechanism of medium-energy electrons on the closed field line remains to be solved. We also report that a density cavity in the wake is observed not above the strongest magnetic field but in its vicinity.

  2. An efficient magnetron transmitter for superconducting accelerators

    Science.gov (United States)

    Kazakevich, G.; Lebedev, V.; Yakovlev, V.; Pavlov, V.

    2016-12-01

    A concept of a highly-efficient high-power magnetron transmitter allowing wide-band phase and the mid-frequency power control at the frequency of the locking signal is proposed. The proposal is aimed for powering Superconducting RF (SRF) cavities of intensity-frontier accelerators. The transmitter is intended to operate with phase and amplitude control feedback loops allowing suppression of microphonics and beam loading in the SRF cavities. The concept utilizes injection-locked magnetrons controlled in phase by the locking signal supplied by a feedback system. The injection-locking signal pre-excites the magnetron and allows its operation below the critical voltage in free run. This realizes control of the magnetron power in an extended range (up to 10 dB) by control of the magnetron current. Experimental studies were carried out with 2.45 GHz, 1 kW, CW magnetrons. They demonstrated stable operation of the magnetrons and the required range of power control at a low noise level. An analysis of the kinetics of the drifting charge within the framework of the presented model of phase focusing in magnetrons substantiates the concept and the experimental results.

  3. The Effect of Unbalanced Coefficient of Magnetron on the Structure and Properties of CNx Coatings

    Institute of Scientific and Technical Information of China (English)

    WEN Xiaobin; LI Xian; WANG Tao; JIANG Bailing

    2011-01-01

    The effect of unbalanced coefficient of magnetron (UCM) on the structure and tribological properties of CrNx hard coatings was studied. The CrNx coatings were deposited on both Si wafer and hardened tool steel substrates using a closed-field unbalanced magnetron sputtering ion plating technique in a gas mixture of Ar+N2 under different unbalanced magnetron conditions. The coatings were characterized by means of XRD, XPS, SEM, microhardness tester and pin-on-disc tribometer to study respectively their structure, chemical bonding state, microstructure, hardness and tribological properties. The experimental results show that the UCM has a profound effect on the structure, hardness and tribological properties of the CrNx coatings. With increasing the values of UCM, the dominant phases in the deposited coatings evolved from Cr+Cr2N to Cr2N+CrN, the microstructure became denser and the hardness increased; in addition, reduced coefficient of friction and improved wear resistance of CrNx coatings were also observed under a larger UCM.

  4. Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering,by producing dense secondary plasma around the substrate,provides a high ion current density.The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal,alloy,and ceramic thin films.The key factor in the CFUBMS system is the ability to transport high ion currents to the substrate,which can enhance the formation of full dense coatings at relatively low value homologous temperature.The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes.Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.

  5. Characterization of hydrogenated and deuterated silicon carbide films codeposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Pantelica, D., E-mail: pantel@ifin.nipne.ro [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Ionescu, P.; Petrascu, H. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Dracea, M.D. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Faculty of Physics, University of Bucharest, 405 Atomistilor Str., RO-077125, P.O.B. MG-11, Magurele-Bucharest (Romania); Statescu, M. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Matei, E.; Rasoga, O. [National Institute of Materials Physics, RO-077125, 105 bis Atomistilor Str., Magurele-Bucharest (Romania); Stancu, C. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Marascu, V. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Faculty of Physics, University of Bucharest, 405 Atomistilor Str., RO-077125, P.O.B. MG-11, Magurele-Bucharest (Romania); Ion, V. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Acsente, T., E-mail: tomy@infim.ro [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Dinescu, G. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania)

    2016-03-15

    In this work we present the deposition of amorphous SiC thin films by radiofrequency dual magnetron sputtering. The dependence of the deposited films properties over the discharges electrical power and the effect of hydrogenous species (H{sub 2} and/or D{sub 2}) addition to main discharge gas (Ar) were investigated. Accurate elemental analysis of the samples, including detection of hydrogen and deuterium, was performed by ion beam analysis (IBA) techniques: RBS (Rutherford Backscattering Spectrometry) and ERDA (Elastic Recoil Detection Analysis). SiC{sub x} thin films with thicknesses between 1700 and 4500 Å and C/Si ratio between 0.2/1 and 1.25/1 were obtained in different deposition conditions. The results prove that thin films of amorphous SiC with well controlled properties can be produced using radiofrequency dual magnetron sputtering.

  6. Negative Ion Sources: Magnetron and Penning

    CERN Document Server

    Faircloth, D C

    2013-01-01

    The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared.

  7. Synergistic effect of bias and target currents for magnetron sputtered MoS{sub 2}-Ti composite films

    Energy Technology Data Exchange (ETDEWEB)

    Buelbuel, Ferhat; Efeoglu, Ihsan [Ataturk Univ., Erzurum (Turkey). Dept. of Mechanical Engineering

    2016-07-01

    In terms of modification of the properties of MoS{sub 2}-Ti composite films, especially tribological properties, significant advances have recently been recorded. However, the commercially production of MoS{sub 2}-Ti composite films is still limited, because the production of desirable MoS{sub 2}-Ti composite coating is only possible by using closed field unbalanced magnetron systems and by the selection of convenient deposition parameters. This requirement has focused the researchers' attention on optimization of deposition parameters. This study is concentrating on the effect of the bias voltage and the target currents for MoS{sub 2}-Ti composite films deposited by pulsed magnetron sputtering (PMS). It is found that the bias and the target currents clearly affect the mechanical, structural and tribological properties of MoS{sub 2}-Ti films.

  8. Magnetic field perturbartions in closed-field-line systems with zero toroidal magnetic field

    Energy Technology Data Exchange (ETDEWEB)

    Mauel, M; Ryutov, D; Kesner, J

    2003-12-02

    In some plasma confinement systems (e.g., field-reversed configurations and levitated dipoles) the confinement is provided by a closed-field-line poloidal magnetic field. We consider the influence of the magnetic field perturbations on the structure of the magnetic field in such systems and find that the effect of perturbations is quite different from that in the systems with a substantial toroidal field. In particular, even infinitesimal perturbations can, in principle, lead to large radial excursions of the field lines in FRCs and levitated dipoles. Under such circumstances, particle drifts and particle collisions may give rise to significant neoclassical transport. Introduction of a weak regular toroidal magnetic field reduces radial excursions of the field lines and neoclassical transport.

  9. Close-field electroporation gene delivery using the cochlear implant electrode array enhances the bionic ear.

    Science.gov (United States)

    Pinyon, Jeremy L; Tadros, Sherif F; Froud, Kristina E; Y Wong, Ann C; Tompson, Isabella T; Crawford, Edward N; Ko, Myungseo; Morris, Renée; Klugmann, Matthias; Housley, Gary D

    2014-04-23

    The cochlear implant is the most successful bionic prosthesis and has transformed the lives of people with profound hearing loss. However, the performance of the "bionic ear" is still largely constrained by the neural interface itself. Current spread inherent to broad monopolar stimulation of the spiral ganglion neuron somata obviates the intrinsic tonotopic mapping of the cochlear nerve. We show in the guinea pig that neurotrophin gene therapy integrated into the cochlear implant improves its performance by stimulating spiral ganglion neurite regeneration. We used the cochlear implant electrode array for novel "close-field" electroporation to transduce mesenchymal cells lining the cochlear perilymphatic canals with a naked complementary DNA gene construct driving expression of brain-derived neurotrophic factor (BDNF) and a green fluorescent protein (GFP) reporter. The focusing of electric fields by particular cochlear implant electrode configurations led to surprisingly efficient gene delivery to adjacent mesenchymal cells. The resulting BDNF expression stimulated regeneration of spiral ganglion neurites, which had atrophied 2 weeks after ototoxic treatment, in a bilateral sensorineural deafness model. In this model, delivery of a control GFP-only vector failed to restore neuron structure, with atrophied neurons indistinguishable from unimplanted cochleae. With BDNF therapy, the regenerated spiral ganglion neurites extended close to the cochlear implant electrodes, with localized ectopic branching. This neural remodeling enabled bipolar stimulation via the cochlear implant array, with low stimulus thresholds and expanded dynamic range of the cochlear nerve, determined via electrically evoked auditory brainstem responses. This development may broadly improve neural interfaces and extend molecular medicine applications.

  10. Multi-frequency recirculating planar magnetrons

    Science.gov (United States)

    Greening, Geoffrey B.; Jordan, Nicholas M.; Exelby, Steven C.; Simon, David H.; Lau, Y. Y.; Gilgenbach, Ronald M.

    2016-08-01

    The multi-frequency recirculating planar magnetron (MFRPM) is the first magnetron capable of simultaneous generation of significantly different output frequencies (1 and 2 GHz) in a single operating pulse. Design and simulation of a prototype MFRPM were followed by hardware fabrication and experimental verification using the Michigan Electron Long Beam Accelerator with a Ceramic insulator at -300 kV, 1-5 kA, and 0.14-0.23 T axial magnetic field. Preliminary results demonstrated simultaneous generation of microwave pulses near 1 GHz and 2 GHz at powers up to 44 MW and 21 MW, respectively, with peak total efficiencies up to 9%.

  11. Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Ziad Y. Banyamin

    2014-10-01

    Full Text Available Fluorine doped tin oxide (FTO coatings have been prepared using the mid-frequency pulsed DC closed field unbalanced magnetron sputtering technique in an Ar/O2 atmosphere using blends of tin oxide and tin fluoride powder formed into targets. FTO coatings were deposited with a thickness of 400 nm on glass substrates. No post-deposition annealing treatments were carried out. The effects of the chemical composition on the structural (phase, grain size, optical (transmission, optical band-gap and electrical (resistivity, charge carrier, mobility properties of the thin films were investigated. Depositing FTO by magnetron sputtering is an environmentally friendly technique and the use of loosely packed blended powder targets gives an efficient means of screening candidate compositions, which also provides a low cost operation. The best film characteristics were achieved using a mass ratio of 12% SnF2 to 88% SnO2 in the target. The thin film produced was polycrystalline with a tetragonal crystal structure. The optimized conditions resulted in a thin film with average visible transmittance of 83% and optical band-gap of 3.80 eV, resistivity of 6.71 × 10−3 Ω·cm, a carrier concentration (Nd of 1.46 × 1020 cm−3 and a mobility of 15 cm2/Vs.

  12. The Development and Application of the Magnetron,

    Science.gov (United States)

    1982-03-31

    of *medicine. The power of the magnetron used is from several tens of watts to several hundred watts. Microwave physiotherapy has been used in...clinical practice for the fast cure of arthritis , rheumatism and the subsidence of swelling. Therapeutic results have been excellent. In recent years

  13. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimat......At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  14. Method and apparatus for improved high power impulse magnetron sputtering

    Science.gov (United States)

    Anders, Andre

    2013-11-05

    A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

  15. DEVICE FOR INVESTIGATION OF MAGNETRON AND PULSED-LASER PLASMA

    Directory of Open Access Journals (Sweden)

    A. P. Burmakov

    2012-01-01

    Full Text Available Various modifications of complex pulsed laser and magnetron deposition thin-film structures unit are presented. They include joint and separate variants of layer deposition. Unit realizes the plasma parameters control and enhances the possibility of laser-plasma and magnetron methods of coatings deposition.

  16. Coating metals on micropowders by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Magnetron sputtering was used to coat various metals on micropowder surfaces. By using this method, the fine particles are better dispersed and can therefore be coated more homogeneously. The micro-powders used include cenospheres from fly ash of coal-burning electric power plants (diameter 40-200 μm and particle density 0.7±0.1 g/cm3), as well as carborundum particles of different sizes. Aluminum, silver, copper, cobalt and nickel were used as the coating metals. Tests showed that the coated metal film was compact adhering tightly on the base powders, and the coated powders possess adequate flow properties.

  17. Oleophobic optical coating deposited by magnetron PVD

    Science.gov (United States)

    Bernt, D.; Ponomarenko, V.; Pisarev, A.

    2016-09-01

    Thin oxinitride films of Zn-Sn-O-N and Si-Al-O-N were deposited on glass by reactive magnetron sputtering at various nitrogen-to-oxygen ratios. Nitrogen added to oxygen led to decrease of the surface roughness and increase of oleophobic properties studied by the oil-drop test. The best oleophobity was obtained for Zn-Sn-O-N oxinitride at Zn:Sn=1:1 and N:O=1:2. Improved oleophobic properties were also demonstrated if the oxinitride film was deposited on top of the multilayer coating as the final step in the industrial cycle of production of energy efficient glass.

  18. Reactive magnetron sputtering deposition of bismuth tungstate onto titania nanoparticles for enhancing visible light photocatalytic activity

    Science.gov (United States)

    Ratova, Marina; Kelly, Peter J.; West, Glen T.; Tosheva, Lubomira; Edge, Michele

    2017-01-01

    Titanium dioxide - bismuth tungstate composite materials were prepared by pulsed DC reactive magnetron sputtering of bismuth and tungsten metallic targets in argon/oxygen atmosphere onto anatase and rutile titania nanoparticles. The use of an oscillating bowl placed beneath the two magnetrons arranged in a co-planar closed field configuration enabled the deposition of bismuth tungstate onto loose powders, rather than a solid substrate. The atomic ratio of the bismuth/tungsten coatings was controlled by varying the power applied to each target. The effect of the bismuth tungstate coatings on the phase, optical and photocatalytic properties of titania was investigated by X-ray diffraction, energy-dispersive X-ray spectroscopy (EDX), Brunauer-Emmett-Teller (BET) surface area measurements, transmission electron microscopy (TEM), UV-vis diffuse reflectance spectroscopy and an acetone degradation test. The latter involved measurements of the rate of CO2 evolution under visible light irradiation of the photocatalysts, which indicated that the deposition of bismuth tungstate resulted in a significant enhancement of visible light activity, for both anatase and rutile titania particles. The best results were achieved for coatings with a bismuth to tungsten atomic ratio of 2:1. In addition, the mechanism by which the photocatalytic activity of the TiO2 nanoparticles was enhanced by compounding it with bismuth tungstate was studied by microwave cavity perturbation. The results of these tests confirmed that such enhancement of the photocatalytic properties is due to more efficient photogenerated charge carrier separation, as well as to the contribution of the intrinsic photocatalytic properties of Bi2WO6.

  19. Unbalanced Cylindrical Magnetron for Accelerating Cavities Coating

    CERN Document Server

    Rosaz, Guillaume; Calatroni, Sergio; Sublet, Alban; Tobarelli, Mauro

    2016-01-01

    We report in this paper the design and qualification of a cylindrical unbalanced magnetron source. The dedicated magnetic assemblies were simulated using a finite element model. A hall-effect magnetic probe was then used to characterize those assemblies and compared to the theoretical magnet profiles. These show a good agreement between the expected and actual values. the qualification of the different magnetic assemblies was then performed by measuring the ion flux density reaching the surface of the sample to be coated using a commercial retarding field energy analyzer. The strongest unbalanced configuration shows an increase from 0.016A.cm^-2 to 0.074A.cm^-2 of the ion flux density reaching the sample surface compared to the standard balanced configuration for a pressure 5.10^-3 mbar and a plasma source power of 300W.

  20. Comparison of hydrophilic properties of TiO{sub 2} thin films prepared by sol-gel method and reactive magnetron sputtering system

    Energy Technology Data Exchange (ETDEWEB)

    Nam, S.-H., E-mail: askaever@skku.edu [Department of Chemistry, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Cho, S.-J.; Jung, C.-K. [Department of Chemistry, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Boo, J.-H., E-mail: jhboo@skku.edu [Department of Chemistry, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Sicha, J.; Herman, D.; Musil, J.; Vlcek, J. [Department of Physics, University of West Bohemia, Univerzitni 22, 306 14 Plzen (Czech Republic)

    2011-08-01

    This article reports on preparation, characterization and comparison of TiO{sub 2} films prepared by sol-gel method using the titanium isopropoxide sol (TiO{sub 2} coating sol 3%) as solvent precursor and reactive magnetron sputtering from substoichiometric TiO{sub 2-x} targets of 50 mm in diameter. Dual magnetron supplied by dc bipolar pulsed power source was used for reactive magnetron sputtering. Depositions were performed on unheated glass substrates. Comparison of photocatalytic properties was based on measurements of hydrophilicity, i.e. evaluation of water contact angle on the film surface after UV irradiation. It is shown, that TiO{sub 2} films prepared by the sol-gel method exhibited higher hydrophilicity in the as-deposited state but has significant deterioration of hydrophilicity during aging, compared to TiO{sub 2} films prepared by magnetron sputtering. To explain this effect AFM, SEM and high resolution XPS measurements were performed. It is shown that the deterioration of hydrophilicity of sol-gel TiO{sub 2} films can be suppressed if as-deposited films are exposed to the plasma of microwave oxygen discharge.

  1. 3-D Printed High Power Microwave Magnetrons

    Science.gov (United States)

    Jordan, Nicholas; Greening, Geoffrey; Exelby, Steven; Gilgenbach, Ronald; Lau, Y. Y.; Hoff, Brad

    2015-11-01

    The size, weight, and power requirements of HPM systems are critical constraints on their viability, and can potentially be improved through the use of additive manufacturing techniques, which are rapidly increasing in capability and affordability. Recent experiments on the UM Recirculating Planar Magnetron (RPM), have explored the use of 3-D printed components in a HPM system. The system was driven by MELBA-C, a Marx-Abramyan system which delivers a -300 kV voltage pulse for 0.3-1.0 us, with a 0.15-0.3 T axial magnetic field applied by a pair of electromagnets. Anode blocks were printed from Water Shed XC 11122 photopolymer using a stereolithography process, and prepared with either a spray-coated or electroplated finish. Both manufacturing processes were compared against baseline data for a machined aluminum anode, noting any differences in power output, oscillation frequency, and mode stability. Evolution and durability of the 3-D printed structures were noted both visually and by tracking vacuum inventories via a residual gas analyzer. Research supported by AFOSR (grant #FA9550-15-1-0097) and AFRL.

  2. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  3. Substrate Heating Effect on c-Axis Texture and Piezoelectric Properties of AlN Thin Films Deposited by Unbalanced Magnetron Sputtering

    Science.gov (United States)

    Hasheminiasari, Masood; Lin, Jianliang

    2016-06-01

    Aluminum nitride (AlN) thin films with highly preferred (002) orientations have been reactively deposited by a pulsed-closed field unbalanced magnetron sputtering system using TiN/Ti as the seed/adhesion layer with various substrate temperatures. The texture, orientation and piezoelectric properties of AlN films were characterized by means of x-ray diffraction, rocking curves and laser interferometry. A Michelson laser interferometer was designed and built to obtain the converse piezoelectric response of the deposited AlN thin films. It was found that a slight substrate temperature increase would significantly affect the (002) orientation and the piezoelectric coefficient of AlN thin films compared to the coating obtained with no intentional substrate heating, while higher temperature applications on substrate deteriorated the c-axis texture of the coatings without significant improvement in the piezoelectric response of AlN films.

  4. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  5. Small grain size zirconium-based coatings deposited by magnetron sputtering at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Jimenez, O., E-mail: omar.jimenez.udg@gmail.com [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Audronis, M.; Leyland, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Flores, M.; Rodriguez, E. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Kanakis, K.; Matthews, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom)

    2015-09-30

    Hard, partly amorphous, ZrTiB(N) coatings were deposited by Physical Vapour Deposition (PVD) onto (111) silicon wafers at low substrate temperatures of 85 and 110 °C using Closed Field Unbalanced Magnetron Sputtering. A segmented rectangular sputter target composed of three pieces (Zr/TiB{sub 2}/Zr) was used as the source of evaporation of coating components. Two different substrate biases (i.e. floating potential and − 50 V) and N{sub 2} reactive-gas flow rates of 2, 4 and 6 sccm were employed as the main deposition parameter variables. The chemical composition, structure, morphology and mechanical properties were investigated using a variety of analytical techniques such as Glow-Discharge Optical Emission Spectroscopy, cross-sectional Scanning Electron Microscopy (SEM), Glancing Angle X-ray Diffraction (GAXRD) and nanoindentation. With other parameters fixed, coating properties were found to be dependent on the substrate negative bias and nitrogen flow rate. Linear scan profiles and SEM imaging revealed that all coatings were smooth, dense and featureless (in fracture cross section) with no apparent columnar morphology or macro-defects. GAXRD structural analysis revealed that mostly metallic phases were formed for coatings containing no nitrogen, whereas a solid solution (Zr,Ti)N single phase nitride was found in most of the reactively deposited coatings — exhibiting a very small grain size due to nitrogen and boron grain refinement effects. Hardness values from as low as 8.6 GPa up to a maximum of 25.9 GPa are related mainly to solid solution strengthening effects. The measured elastic moduli correlated with the trends in hardness behaviour; values in the range of 120–200 GPa were observed depending on the selected deposition parameters. Also, high H/E values (> 0.1) were achieved with several of the coatings.

  6. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, w

  7. Production of carbon nanotubes by the magnetron DC sputtering method

    NARCIS (Netherlands)

    Antonenko, SV; Mal'tsev, SN

    2005-01-01

    Carbon films containing multiwall nanotubes were produced by the magnetron de sputtering method. A graphite disc with Y and Ni catalyst plates was used as a target. The structural and morphological properties of the films were investigated using a JEM 2000EXII transmission electron microscope. The f

  8. The accuracy of using the spectral width boundary measured in off-meridional SuperDARN HF radar beams as a proxy for the open-closed field line boundary

    Science.gov (United States)

    Chisham, G.; Freeman, M. P.; Sotirelis, T.; Greenwald, R. A.

    2005-10-01

    Determining reliable proxies for the ionospheric signature of the open-closed field line boundary (OCB) is crucial for making accurate measurements of magnetic reconnection. This study compares the latitudes of spectral width boundaries (SWBs) measured by different beams of the Goose Bay radar of the Super Dual Auroral Radar Network (SuperDARN), with the latitudes of OCBs determined using the low-altitude Defense Meteorological Satellite Program (DMSP) spacecraft, in order to determine whether the accuracy of the SWB as a proxy for the ionospheric projection of the OCB depends on the line-of-sight direction of the radar beam. The latitudes of SWBs and OCBs were identified using automated algorithms applied to 5 years (1997 2001) of data measured in the 1000 1400 magnetic local time (MLT) range. Six different Goose Bay radar beams were used, ranging from those aligned in the geomagnetic meridional direction to those aligned in an almost zonal direction. The results show that the SWB is a good proxy for the OCB in near-meridionally-aligned beams but becomes progressively more unreliable for beams greater than 4 beams away from the meridional direction. We propose that SWBs are identified at latitudes lower than the OCB in the off-meridional beams due to the presence of high spectral width values that result from changes in the orientation of the beams with respect to the gradient in the large-scale ionospheric convection pattern. Keywords. Ionosphere (Instruments and techniques; Plasma convection) Magnetospheric physics (Magnetopause, cusp and boundary layers)

  9. Modeling and experimental studies of a side band power re-injection locked magnetron

    Science.gov (United States)

    Ye, Wen-Jun; Zhang, Yi; Yuan, Ping; Zhu, Hua-Cheng; Huang, Ka-Ma; Yang, Yang

    2016-12-01

    A side band power re-injection locked (SBPRIL) magnetron is presented in this paper. A tuning stub is placed between the external injection locked (EIL) magnetron and the circulator. Side band power of the EIL magnetron is reflected back to the magnetron. The reflected side band power is reused and pulled back to the central frequency. A phase-locking model is developed from circuit theory to explain the process of reuse of side band power in SBPRIL magnetron. Theoretical analysis proves that the side band power is pulled back to the central frequency of the SBPRIL magnetron, then the amplitude of the RF voltage increases and the phase noise performance is improved. Particle-in-cell (PIC) simulation of a 10-vane continuous wave (CW) magnetron model is presented. Computer simulation predicts that the frequency spectrum’s peak of the SBPRIL magnetron has an increase of 3.25 dB compared with the free running magnetron. The phase noise performance at the side band offset reduces 12.05 dB for the SBPRIL magnetron. Besides, the SBPRIL magnetron experiment is presented. Experimental results show that the spectrum peak rises by 14.29% for SBPRIL magnetron compared with the free running magnetron. The phase noise reduces more than 25 dB at 45-kHz offset compared with the free running magnetron. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

  10. Characteristic Modules of Dual Extensions and Gr(o)bner Bases

    Institute of Scientific and Technical Information of China (English)

    Yun Ge XU; Long Cai LI

    2004-01-01

    Let C be a finite dimensional directed algebra over an algebraically closed field k and A = A(C) the dual extension of C. The characteristic modules of A are constructed explicitly for a class of directed algebras, which generalizes the results of Xi. Furthermore, it is shown that the characteristic modules of dual extensions of a certain class of directed algebras admit the left Grobner basis theory in the sense of E. L. Green.

  11. Incorporation of N in TiO{sub 2} films grown by DC-reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Serio, S. [CEFITEC, Departamento de Fisica, Faculdade de Ciencias e Tecnologia da Universidade Nova de Lisboa, 2829-516 Caparica (Portugal); Melo Jorge, M.E. [CCMM, Departamento de Quimica e Bioquimica, Faculdade de Ciencias da Universidade de Lisboa, Campo Grande C8, 1749-016 Lisboa (Portugal); Nunes, Y. [CEFITEC, Departamento de Fisica, Faculdade de Ciencias e Tecnologia da Universidade Nova de Lisboa, 2829-516 Caparica (Portugal); Barradas, N.P. [Instituto Tecnologico e Nuclear and CFNUL, E.N. 10, Sacavem 2686-953 (Portugal); Alves, E., E-mail: ealves@itn.pt [Instituto Tecnologico e Nuclear and CFNUL, E.N. 10, Sacavem 2686-953 (Portugal); Munnik, F. [Helmholtz-Zentrum Dresden-Rossendorf (Germany)

    2012-02-15

    Photocatalytic properties of TiO{sub 2} are expected to play an important role on emerging technologies based on OH radicals to destroy harmful nonbiodegradable organic and inorganic contaminants in water. The drawback is the wide band gap of TiO{sub 2} (3.2 eV) limiting its use to the UV part of electromagnetic spectrum under sunlight. Therefore, modifications of TiO{sub 2} are needed to tune the gap in order to allow an efficient use of the entire solar spectrum. One possibility is N-doping of TiO{sub 2} to make the photocatalytic activity possible under visible light and more suitable for water treatment. In our study nitrogen-doped TiO{sub 2} (TiO{sub 2-x}N{sub x}) films were deposited by DC-reactive magnetron sputtering using a dual-magnetron co-deposition apparatus on unheated glass and silicon substrates using a pure titanium target. The depth profile of nitrogen was measured with heavy ion elastic recoil detection analysis combined with Rutherford backscattering spectrometry (RBS) and correlated with the optical and structural properties obtained by UV-VIS spectroscopy and X-ray diffraction (XRD).

  12. The role of Ohmic heating in dc magnetron sputtering

    Science.gov (United States)

    Brenning, N.; Gudmundsson, J. T.; Lundin, D.; Minea, T.; Raadu, M. A.; Helmersson, U.

    2016-12-01

    Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The secondary electron emission yield {γ\\text{SE}} is identified as the key parameter determining the relative importance of the two processes. For a conventional 5 cm diameter planar dc magnetron, Ohmic heating is found to be more important than sheath energization for secondary electron emission yields below around 0.1.

  13. Deposition of copper coatings in a magnetron with liquid target

    Energy Technology Data Exchange (ETDEWEB)

    Tumarkin, A. V., E-mail: sanyahrustal@mail.ru; Kaziev, A. V.; Kolodko, D. V.; Pisarev, A. A.; Kharkov, M. M.; Khodachenko, G. V. [National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation)

    2015-12-15

    Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range.

  14. Methods of Phase and Power Control in Magnetron Transmitters for Superconducting Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Kazadevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

    2017-05-01

    Various methods of phase and power control in magnetron RF sources of superconducting accelerators intended for ADS-class projects were recently developed and studied with conventional 2.45 GHz, 1 kW, CW magnetrons operating in pulsed and CW regimes. Magnetron transmitters excited by a resonant (injection-locking) phasemodulated signal can provide phase and power control with the rates required for precise stabilization of phase and amplitude of the accelerating field in Superconducting RF (SRF) cavities of the intensity-frontier accelerators. An innovative technique that can significantly increase the magnetron transmitter efficiency at the widerange power control required for superconducting accelerators was developed and verified with the 2.45 GHz magnetrons operating in CW and pulsed regimes. High efficiency magnetron transmitters of this type can significantly reduce the capital and operation costs of the ADSclass accelerator projects.

  15. Bias-magnetron sputtering of tungsten carbide coatings on steel; Bias-Magnetron Sputtern von Wolframkarbid-Schichten auf Stahl

    Energy Technology Data Exchange (ETDEWEB)

    Gubisch, M.; Spiess, L.; Romanus, H.; Schawohl, J.; Knedlik, C. [Technische Universitaet Ilmenau, Institut fuer Werkstofftechnik/ Zentrum fuer Mikro- und Nanotechnologien (ZMN), Ilmenau (Germany)

    2004-11-01

    The influence of bias voltage between 0 V to -800 V on the properties of dc and rf magnetron sputtered tungsten carbide coatings with 1 {mu}m thickness on cold work steel 90MnCrV8 were determined. The coatings were analysed with SEM, AFM, EDX, XRD and micro hardness tester. The morphology, the chemical composition, the phase transformation and the hardness of the deposited layers were appropriated. Non-stoechiometric cubic phase of tungsten carbide WC{sub 1-x} with <100> preferred orientation formed by non reactive magnetron sputtering without ion bombardment. Chemical composition, crystallinity, preferred orientation, morphology and phases are influence by variation of bias voltage. These changes in coating properties results in significant variation of hardness between 8 GPa and 20 GPa. (Abstract Copyright [2004], Wiley Periodicals, Inc.) [German] In dieser Arbeit wird der Einfluss der Biasspannung im Bereich von 0 V bis -800 V auf die Eigenschaften von 1 {mu}m dicken DC und RF Magnetron gesputterten Wolframkarbidschichten auf niedriglegierten Kaltarbeitsstahl 90MnCrV8 untersucht. Die Schichten wurden mittels REM, EDX, AFM, Universalhaertepruefgeraet und XRD hinsichtlich der wichtigsten Schichteigenschaften wie Morphologie, Phasenausbildung, Vorzugsorientierung, Universalhaerte und chemischer Zusammensetzung charakterisiert. Ohne zusaetzlichen Ionenbeschuss bildet sich beim nichtreaktiven Magnetron Sputtern die nicht stoechiometrische kubische Phase des Wolframkarbids WC{sub 1-x} mit einer <100>-Orientierung aus. In Abhaengigkeit der Biasspannung wird die chemischen Zusammensetzung, Kristallinitaet, Vorzugsorientierung, Morphologie und die Phasenausbildung beeinflusst. Die Veraenderungen der genannten Schichteigenschaften fuehrten zu signifikanten Haerteaenderungen im Bereich von 8 GPa und 20 GPa. (Abstract Copyright [2004], Wiley Periodicals, Inc.)

  16. Application of magnetron sputtering for producing bioactive ceramic coatings on implant materials

    Indian Academy of Sciences (India)

    J Z Shi; C Z Chen; H J Yu; S J Zhang

    2008-11-01

    Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings. In this paper, principle and character of magnetron sputtering is introduced, and development of the hydroxyapatite and its composite coatings application is reviewed. In addition, influence of heat treatment on magnetron sputtered coatings is discussed. The heat treated coatings have been shown to exhibit bioactive behaviour both in vivo and in vitro. At last, the future application of the bioactive ceramic coating deposited by magnetron sputtering is mentioned.

  17. Hydrogen storage properties of preferentially orientated Mg-Ni multilayer film prepared by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    YE Suyun; OUYANG Liuzhang; ZHU Min

    2006-01-01

    Mg-Ni multi-layer thin film was deposited on (001) Si wafer by magnetron sputtering with dual-target. X-ray diffraction (XRD) and scanning electron microscopy (SEM) analysis reveal that the microstructure of the Mg-Ni multilayer thin film is composed of fine-crystalline Ni layer and crystalline [001] Mg layer. Hydrogenation process of the films were carried out by using the automatic gas reaction controller. The films undergone hydrogenation for different time were analyzed by XRD. The results show that hydrogenation properties of Mg with different preferential orientations are different. (002) diffraction peak of Mg disappears in compensating the appearing of the peaks of Mg2NiH4 and MgH2 in hydrogenation at 533 K, while the (101) peak still remains. The result reveals that the Mg film with (001) preferential orientation absorbs hydrogen at certain temperature easier than that of the Mg film with (101) orientation. This phenomenon can be explained in the view point of the energy change for the nucleation and growth of hydride in different crystal plane.

  18. Dual diagnosis

    OpenAIRE

    2013-01-01

    Dual diagnosis denotes intertwining of intellectual disabilities with mental disorders. With the help of systematic examination of literature, intellectual disabilities are determined (they are characterized by subaverage intellectual activity and difficulties in adaptive skills), along side mental disorders. Their influence is seen in changes of thinking, perception, emotionality, behaviour and cognition. Mental disorders often occur with people with intellectual disabilities (data differs f...

  19. Development of magnetron sputtering simulator with GPU parallel computing

    Science.gov (United States)

    Sohn, Ilyoup; Kim, Jihun; Bae, Junkyeong; Lee, Jinpil

    2014-12-01

    Sputtering devices are widely used in the semiconductor and display panel manufacturing process. Currently, a number of surface treatment applications using magnetron sputtering techniques are being used to improve the efficiency of the sputtering process, through the installation of magnets outside the vacuum chamber. Within the internal space of the low pressure chamber, plasma generated from the combination of a rarefied gas and an electric field is influenced interactively. Since the quality of the sputtering and deposition rate on the substrate is strongly dependent on the multi-physical phenomena of the plasma regime, numerical simulations using PIC-MCC (Particle In Cell, Monte Carlo Collision) should be employed to develop an efficient sputtering device. In this paper, the development of a magnetron sputtering simulator based on the PIC-MCC method and the associated numerical techniques are discussed. To solve the electric field equations in the 2-D Cartesian domain, a Poisson equation solver based on the FDM (Finite Differencing Method) is developed and coupled with the Monte Carlo Collision method to simulate the motion of gas particles influenced by an electric field. The magnetic field created from the permanent magnet installed outside the vacuum chamber is also numerically calculated using Biot-Savart's Law. All numerical methods employed in the present PIC code are validated by comparison with analytical and well-known commercial engineering software results, with all of the results showing good agreement. Finally, the developed PIC-MCC code is parallelized to be suitable for general purpose computing on graphics processing unit (GPGPU) acceleration, so as to reduce the large computation time which is generally required for particle simulations. The efficiency and accuracy of the GPGPU parallelized magnetron sputtering simulator are examined by comparison with the calculated results and computation times from the original serial code. It is found that

  20. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  1. IR emission from the target during plasma magnetron sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cormier, P.-A. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Thomann, A.-L., E-mail: anne-lise.thomann@univ-orleans.fr [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Dolique, V. [LMA, Université Claude Bernard Lyon I 7 Avenue Pierre de Coubertin, 69622 Villeurbanne Cedex (France); Balhamri, A. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Université Hassan 1, École Supérieure de Technologie, 218 Berrechid (Morocco); Dussart, R.; Semmar, N.; Lecas, T.; Brault, P. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Snyders, R. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium); Konstantinidis, S. [Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium)

    2013-10-31

    In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma–target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 °C to 870 °C. - Highlights: • During magnetron sputtering process the heated target emits IR radiation. • We follow in real time the energy transferred to the deposited film by IR radiation. • IR radiation can be the main energy contribution in balanced pulsed processes. • IR radiation might affect the deposition process and the final film properties.

  2. High-power magnetron transmitter as an RF source for superconducting linear accelerators

    CERN Document Server

    Kazakevich, Grigory; Flanagan, Gene; Marhauser, Frank; Yakovlev, Vyacheslav; Chase, Brian; Lebedev, Valeri; Nagaitsev, Sergei; Pasquinelli, Ralph; Solyak, Nikolay; Quinn, Kenneth; Wolff, Daniel; Pavlov, Viatcheslav

    2014-01-01

    A concept of a high-power magnetron transmitter for operation within a wideband control feedback loop in phase and amplitude is presented. This transmitter is proposed to drive Superconducting RF (SRF) cavities for intensity-frontier GeV-scale proton/ion linacs. The transmitter performance at the dynamic control was verified in experiments with CW, S-Band, 1 kW magnetrons. The wideband control of magnetrons, required for the superconducting linacs, was realized using the magnetrons, injection-locked by the phase-modulated signals. The capabilities of the magnetrons injection-locked by the phase-modulated signals and adequateness for feeding of SRF cavities were verified by measurements of the transfer function magnitude characteristics of single and 2-cascade magnetrons, by measurements the magnetrons phase performance and by measurements of spectra of the carrier frequency. At the ratio of power of locking signal to output power less than -13 dB (in 2-cascade scheme per magnetron, respectively) we demonstrat...

  3. BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

    Science.gov (United States)

    Kamenetskikh, A. S.; Gavrilov, N. V.; Koryakova, O. V.; Cholakh, S. O.

    2017-05-01

    Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.

  4. A High-power 650 MHz CW Magnetron Transmitter for Intensity Frontier Superconducting Accelerators

    CERN Document Server

    Treado, T A; Nagaitsev, S; Pasquinelli, R J; Yakovlev, V P; Flanagan, G; Johnson, R P; Kazakevich, G M; Marhauser, F; Neubauer, M L

    2013-01-01

    A concept of a 650 MHz CW magnetron transmitter with fast control in phase and power, based on two-stage injection-locked CW magnetrons, has been proposed to drive Superconducting Cavities (SC) for intensity-frontier accelerators. The concept is based on a theoretical model considering a magnetron as a forced oscillator and experimentally verified with a 2.5 MW pulsed magnetron. To fulfill fast control of phase and output power requirements of SC accelerators, both two-stage injection-locked CW magnetrons are combined with a 3-dB hybrid. Fast control in output power is achieved by varying the input phase of one of the magnetrons. For output power up to 250 kW we expect the output/input power ratio to be about 35 to 40 dB in CW or quasi-CW mode with long pulse duration. All magnetrons of the transmitter should be based on commercially available models to decrease the cost of the system. An experimental model using 1 kW, CW, S-band, injection-locked magnetrons with a 3-dB hybrid combiner has been developed and ...

  5. Discharge current modes of high power impulse magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Zhongzhen Wu

    2015-09-01

    Full Text Available Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

  6. QCD Dual

    DEFF Research Database (Denmark)

    Sannino, Francesco

    2009-01-01

    We uncover a novel solution of the 't Hooft anomaly matching conditions for QCD. Interestingly in the perturbative regime the new gauge theory, if interpreted as a possible QCD dual, predicts the critical number of flavors above which QCD in the nonperturbative regime, develops an infrared stable...... fixed point. Remarkably this value is identical to the maximum bound predicted in the nonpertubative regime via the all-orders conjectured beta function for nonsupersymmetric gauge theories.......We uncover a novel solution of the 't Hooft anomaly matching conditions for QCD. Interestingly in the perturbative regime the new gauge theory, if interpreted as a possible QCD dual, predicts the critical number of flavors above which QCD in the nonperturbative regime, develops an infrared stable...

  7. First demonstration and performance of an injection locked continuous wave magnetron to phase control a superconducting cavity

    Energy Technology Data Exchange (ETDEWEB)

    A.C. Dexter, G. Burt, R.G. Carter, I. Tahir, H. Wang, K. Davis, R. Rimmer

    2011-03-01

    The applications of magnetrons to high power proton and cw electron linacs are discussed. An experiment is described where a 2.45 GHz magnetron has been used to drive a single cell superconducting cavity. With the magnetron injection locked, a modest phase control accuracy of 0.95° rms has been demonstrated. Factors limiting performance have been identified.

  8. Synthesizing mixed phase titania nanocomposites with enhanced photoactivity and redshifted photoresponse by reactive DC magnetron sputtering

    Science.gov (United States)

    Chen, Le

    Recent work points out the importance of the solid-solid interface in explaining the high photoactivity of mixed phase TiO2 catalysts. The goal of this research was to probe the synthesis-structure-function relationships of the solid-solid interfaces created by the reactive direct current (DC) magnetron sputtering of titanium dioxide. I hypothesize that the reactive DC magnetron sputtering is a useful method for synthesizing photo-catalysts with unique structure including solid-solid interfaces and surface defects that are associated with enhanced photoreactivity as well as a photoresponse shifted to longer wavelengths of light. I showed that sputter deposition provides excellent control of the phase and interface formation as well as the stoichiometry of the films. I explored the effects exerted by the process parameters of pressure, oxygen partial pressure, target power, substrate bias (RF), deposition incidence angle, and post annealing treatment on the structural and functional characteristics of the catalysts. I have successfully made pure and mixed phase TiO2 films. These films were characterized with UV-Vis, XPS, AFM, SEM, TEM, XRD and EPR, to determine optical properties, elemental stoichiometry, surface morphology, phase distribution and chemical coordination. Bundles of anatase-rutile nano-columns having high densities of dual-scale of interfaces among and within the columns are fabricated. Photocatalytic performance of the sputtered films as measured by the oxidation of the pollutant, acetaldehyde, and the reduction of CO2 for fuel (CH4) production was compared (normalized for surface area) to that of mixed phase TiO2 fabricated by other methods, including flame hydrolysis powders, and solgel deposited TiO 2 films. The sputtered mixed phase materials were far superior to the commercial standard (Degussa P25) and solgel TiO2 based on gas phase reaction of acetaldehyde oxidation under UV light and CO2 reduction under both UV and visible illuminations. The

  9. On Tomonaga's theory of split-anode magnetrons

    Science.gov (United States)

    Dittrich, Walter

    2016-06-01

    This article offers a review of the history of radar research and its application in the 20th century. After describing the wartime work of Sin-Itiro Tomonaga and his theory of the cavity magnetron, we formulate the equations of motion of an electron in a cavity magnetron using action-angle variables. This means following the electron's path on its way from a cylindrical cathode moving toward a co-axial cylindrical anode in presence of a uniform magnetic field parallel to the common axis. After analyzing the situation without coupling to an external oscillatory electric field, we employ methods of canonical perturbation theory to find the resonance condition between the frequencies of the free theory ωr, ωϕ and the applied perturbing oscillatory frequency ω. A long-time averaging process will then eliminate the periodic terms in the equation for the now time-dependent action-angle variables. The terms that are no longer periodic will cause secular changes so that the canonical action-angle variables (J, δ) change in a way that the path of the electron will deform gradually so that it can reach the anode. How the ensemble of the initially randomly distributed electrons forms spokes and how their energy is conveyed to the cavity-field oscillation is the main focus of this article. Some remarks concerning the importance of results in QED and the invention of radar theory and application conclude the article.

  10. Reactive high power impulse magnetron sputtering: combining simulation and experiment

    Science.gov (United States)

    Kozak, Tomas; Vlcek, Jaroslav

    2016-09-01

    Reactive high-power impulse magnetron sputtering (HiPIMS) has recently been used for preparation of various oxide films with high application potential, such as TiO2, ZrO2, Ta2O5, HfO2, VO2. Using our patented method of pulsed reactive gas flow control with an optimized reactive gas inlet, we achieved significantly higher deposition rates compared to typical continuous dc magnetron depositions. We have developed a time-dependent model of the reactive HiPIMS. The model includes a depth-resolved description of the sputtered target (featuring sputtering, implantation and knock-on implantation processes) and a parametric description of the discharge plasma (dissociation of reactive gas, ionization and return of sputtered atoms and gas rarefaction). The model uses a combination of experimental and simulation data as input. We have calculated the composition of the target and substrate for several deposition conditions. The simulations predict a reduced compound coverage of the target in HiPIMS compared to the continuous dc sputtering regime which explains the increased deposition rate. The simulations show that an increased dissociation of oxygen in a HiPIMS discharge is beneficial to achieve stoichiometric films on the substrate at high deposition rates.

  11. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  12. Some New Views on the Principles of Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHAO Jia-xue; FANG Kai-ming; TONG Hong-hui

    2004-01-01

    In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic confinements in three spatial dimensions on moving charged particles (including electrons) in this kind of non-uniform field. They are the longitudinal cycloidal motion, the horizontal simple harmonic-like motion (with varying amplitudes), and the vertical repelling action. The horizontal magnetic confinement in a mirror-like magnetic field keeps glow discharge lane completely parallel to the corridor of magnetic force lines, therefore only an effectively closed magnet array structure can form a relatively uniform and closed discharge lane. The main reasons for electrons' releasing from magnetic confinement are the vertical magnetic repelling force as well as a more and more weak confinement action in outer range etc. The dominant reasons for a comparatively low increase of substrate's temperature are that the density of bombarding electrons near the substrate is relatively low and their spatial distribution is relatively uniform (compared with that near the target surface). The erosion lane with an inverted Gauss's distribution shape on a magnetron sputtered target is due to that,with sputtering, the distribution width of the critical density of electrons shrinks continuously but the sputtering effect in the centerline of the corridor is always the most powerful.

  13. Elementary surface processes during reactive magnetron sputtering of chromium

    Energy Technology Data Exchange (ETDEWEB)

    Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von [Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum (Germany)

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  14. Simulation to Predict Target Erosion of Planar DC Magnetron

    Institute of Scientific and Technical Information of China (English)

    QIU Qingquan; LI Qingfu; SU Jingjing; JIAO Yu; FINLEY Jing

    2008-01-01

    Plasma properties in a planar DC magnetron system are simulated by a non-selfconsistent particle method in two dimensions.Through tracing the trajectories of the energetic electrons in the specified electric field and the magnetic field,and treating the collision process by Monte Carlo method,the spatial profile of ionization events can be obtained conveniently.Assuming that the ions speed up from the ionization points and bombard the target with the energy at these points,and according to the Yamamura/Tawara method,the target erosion can be predicted.The magnetic field is calculated by the finite element method,and the electric field is estimated according to the self-consistent simulation and measured results.The influence of the time step size on the target erosion profile is analysed first to find a proper step size.Then the influence of electric field estimated on the erosion profile is discussed.The erosion profile may become narrower if the sheath thickness is increased.Finally,considering the dynamic erosion process,the erosion profile may get wider over time for the magnetron with shunt bar.

  15. Recent Operation of the FNAL Magnetron H- Ion Source

    Energy Technology Data Exchange (ETDEWEB)

    Karns, Patrick R. [Fermilab; Bollinger, D. S. [Fermilab; Sosa, A. [Fermilab

    2016-09-06

    This paper will detail changes in the operational paradigm of the Fermi National Accelerator Laboratory (FNAL) magnetron H- ion source due to upgrades in the accelerator system. Prior to November of 2012 the H- ions for High Energy Physics (HEP) experiments were extracted at ~18 keV vertically downward into a 90 degree bending magnet and accelerated through a Cockcroft-Walton accelerating column to 750 keV. Following the upgrade in the fall of 2012 the H- ions are now directly extracted from a magnetron at 35 keV and accelerated to 750 keV by a Radio Frequency Quadrupole (RFQ). This change in extraction energy as well as the orientation of the ion source required not only a redesign of the ion source, but an updated understanding of its operation at these new values. Discussed in detail are the changes to the ion source timing, arc discharge current, hydrogen gas pressure, and cesium delivery system that were needed to maintain consistent operation at >99% uptime for HEP, with an increased ion source lifetime of over 9 months.

  16. Development of new cylindrical magnetrons for industrial use

    CERN Document Server

    Clayton, B

    2000-01-01

    four-fold system. In an attempt to tackle this problem, a finite element model of the magnetic field generated by the magnetic assembly was built, run and verified. Changes were made to this model, and a new .magnet assembly was built and tested based on the results obtained. This did not lead to a final solution of the problem, but has set bounds within which the solution must lie. A number of alternative techniques were considered and tested with a view to the construction of a cylindrical sputtering device. This device was required to be capable of depositing tribological coatings inside approximately cylindrical substrates of diameters less than 100mm, in an industrial situation. A cylindrical magnetron device was designed, and constructed as a prototype, using a magnetic assembly inside a cylindrical target with outside diameter (o.d.) 40mm. Two alternative magnetic assemblies were tested, and found to have complimentary advantages. The magnetron characteristics of the device were tested, as were key pro...

  17. Research and Development for an Alternative RF Source Using Magnetrons in CEBAF

    Science.gov (United States)

    Jacobs, Andrew

    2016-09-01

    At Jefferson Lab, klystrons are currently used as a radiofrequency (RF) power source for the 1497 MHz Continuous Electron Beam Accelerator Facility (CEBAF) Continuous Wave (CW) system. A drop-in replacement for the klystrons in the form of a system of magnetrons is being developed. The klystron DC-RF efficiency at CEBAF is 35-51% while the estimated magnetron efficiency is 80-90%. Thus, the introduction of magnetrons to CEBAF will have enormous benefits in terms of electrical power saving. The primary focus of this project was to characterize a magnetron's frequency pushing and pulling curves at 2.45 GHz with stub tuner and anode current adjustments so that a Low Level RF controller for a new 1.497 GHz magnetron can be built. A Virtual Instrument was created in LabVIEW, and data was taken. The resulting data allowed for the creation of many constant lines of frequency and output power. Additionally, the results provided a characterization of magnetron oven temperature drift over the operation time and the relationship between anode current and frequency. Using these results, the control model of different variables and their feedback or feedforward that affect the frequency pushing and pulling of the magnetron is better developed. Department of Energy, Science Undergraduate Laboratory Internships, and Jefferson Lab.

  18. GAS FLOW CONTROL SYSTEM IN REACTIVE MAGNETRON SPUTTERING TECHNOLOGY

    Directory of Open Access Journals (Sweden)

    I. M. Klimovich

    2015-01-01

    Full Text Available  It is known that the discharge parameters and the chemical composition of the particles flux impinging onto the substrate during a reactive magnetron sputtering are unstable. As a result spontaneous transitions between the «metal» mode of the target surface and the «poisoned» mode of the target surface have been observed. This leads to nonrepeatability of the coating compositions from process to process. The aim of this work is to design a gas flow control system for reactive sputtering processes. The control system allows to maintain a steady nonequilibrium state of the magnetron discharge in transition mode where the chemical state of the target surface is unstable. The intensities of spectral lines of the discharge spectrum are proposed as control parameters. Photodiode detectors were used for registration of intensities of spectral lines. A gas flow control system regulates argon and reactive gas flow automatically, using feedback signals from photodiode detectors on the intensities of the spectral lines, vacuum gauge, ion current sensor, sensors of discharge current and voltage. As an example, the process of reactive magnetron Ti-Al-N deposition is considered. The following discharge parameters are controlled during sputtering a composite target based on Ti with Al cylindrical inserts: current, voltage, total pressure of a gas mixture, substrate temperature, bias voltage and current of the substrate. Nitrogen flow was controlled by the spectral line intensity of titanium TiI 506,5 nm. The value of the line intensity is connected with the value of reactivity. Elemental composition and structure of the Ti-Al-N coatings were studied using Rutherford backscattering spectroscopy, scanning electron microscopy and X-ray diffraction. It was found, that stoichiometric Ti-Al-N coatings have a globular structure, enhanced hardness and low friction coefficient in contrast to Ti-Al-N coatings with nonstoichiometric composition, which have a

  19. High-current electron gun with a planar magnetron integrated with an explosive-emission cathode

    Science.gov (United States)

    Kiziridi, P. P.; Ozur, G. E.

    2017-05-01

    A new high-current electron gun with plasma anode and explosive-emission cathode integrated with planar pulsed powered magnetron is described. Five hundred twelve copper wires 1 mm in diameter and 15 mm in height serve as emitters. These emitters are installed on stainless steel disc (substrate) with 3-mm distance between them. Magnetron discharge plasma provides increased ion density on the periphery of plasma anode formed by high-current Penning discharge ignited within several milliseconds after starting of the magnetron discharge. The increased on the periphery ion density improves the uniformity of high-current electron beam produced in such an electron gun.

  20. Simulation Study Using an Injection Phase-locked Magnetron as an Alternative Source for SRF Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Haipeng [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Plawski, Tomasz E. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Rimmer, Robert A. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)

    2015-09-01

    As a drop-in replacement for the CEBAF CW klystron system, a 1497 MHz, CW-type high-efficiency magnetron using injection phase lock and amplitude variation is attractive. Amplitude control using magnetic field trimming and anode voltage modulation has been studied using analytical models and MATLAB/Simulink simulations. Since the 1497 MHz magnetron has not been built yet, previously measured characteristics of a 2.45GHz cooker magnetron are used as reference. The results of linear responses to the amplitude and phase control of a superconducting RF (SRF) cavity, and the expected overall benefit for the current CEBAF and future MEIC RF systems are presented in this paper.

  1. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    CERN Document Server

    Martines, E; Cavazzana, R; Adámek, J; Antoni, V; Serianni, G; Spolaore, M; Vianello, N

    2014-01-01

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

  2. Anisotropies in magnetron sputtered carbon nitride thin films

    Science.gov (United States)

    Hellgren, Niklas; Johansson, Mats P.; Broitman, Esteban; Hultman, Lars; Sundgren, Jan-Eric

    2001-04-01

    Carbon nitride CNx (0⩽x⩽0.35) thin films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges have been studied with respect to microstructure using electron microscopy, and elastic modulus using nanoindentation and surface acoustic wave analyses. For growth temperature of 100 °C, the films were amorphous, and with an isotropic Young's modulus of ˜170-200 GPa essentially unaffected by the nitrogen fraction. The films grown at elevated temperatures (350-550 °C) show anisotropic mechanical properties due to a textured microstructure with standing basal planes, as observed from measuring the Young's modulus in different directions. The modulus measured in the plane of the film was ˜60-80 GPa, while in the vertical direction the modulus increased considerably from ˜25 to ˜200 GPa as the nitrogen content was increased above ˜15 at. %.

  3. GaAs Films Prepared by RF-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  4. Magnetron-Sputtered YSZ and CGO Electrolytes for SOFC

    Science.gov (United States)

    Solovyev, A. A.; Shipilova, A. V.; Ionov, I. V.; Kovalchuk, A. N.; Rabotkin, S. V.; Oskirko, V. O.

    2016-08-01

    Reactive magnetron sputtering has been used for deposition of yttria-stabilized ZrO2 (YSZ) and gadolinium-doped CeO2 (CGO) layers on NiO-YSZ commercial anodes for solid oxide fuel cells. To increase the deposition rate and improve the quality of the sputtered thin oxide films, asymmetric bipolar pulse magnetron sputtering was applied. Three types of anode-supported cells, with single-layer YSZ or CGO and YSZ/CGO bilayer electrolyte, were prepared and investigated. Optimal thickness of oxide layers was determined experimentally. Based on the electrochemical characteristics of the cells, it is shown that, at lower operating temperatures of 650°C to 700°C, the cells with single-layer CGO electrolyte are most effective. The power density of these fuel cells exceeds that of the cell based on YSZ single-layer electrolyte at the same temperature. Power densities of 650 mW cm-2 and 500 mW cm-2 at 700°C were demonstrated by cells with single-layer YSZ and CGO electrolyte, respectively. Significantly enhanced maximum power density was achieved in a bilayer-electrolyte single cell, as compared with cells with a single electrolyte layer. Maximum power density of 1.25 W cm-2 at 800°C and 1 W cm-2 at 750°C under voltage of 0.7 V were achieved for the YSZ/CGO bilayer electrolyte cell with YSZ and CGO thickness of about 4 μm and 1.5 μm, respectively. This signifies that the YSZ thin film serves as a blocking layer to prevent electrical current leakage in the CGO layer, leading to the overall enhanced performance. This performance is comparable to the state of the art for cells based on YSZ/CGO bilayer electrolyte.

  5. Magnetron sputtered nanostructured cadmium oxide films for ammonia sensing

    Energy Technology Data Exchange (ETDEWEB)

    Dhivya, P. [Functional Nanomaterials and Devices Lab, Centre for Nanotechnology and Advanced Biomaterials and School of Electrical and Electronics Engineering, SASTRA University, Thanjavur-613 401 (India); Prasad, A.K. [Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam-603 102 (India); Sridharan, M., E-mail: m.sridharan@ece.sastra.edu [Functional Nanomaterials and Devices Lab, Centre for Nanotechnology and Advanced Biomaterials and School of Electrical and Electronics Engineering, SASTRA University, Thanjavur-613 401 (India)

    2014-06-01

    Nanostructured cadmium oxide (CdO) films were deposited on to glass substrates by reactive dc magnetron sputtering technique. The depositions were carried out for different deposition times in order to obtain films with varying thicknesses. The CdO films were polycrystalline in nature with cubic structure showing preferred orientation in (1 1 1) direction as observed by X-ray diffraction (XRD). Field-emission scanning electron microscope (FE-SEM) micrographs showed uniform distribution of grains of 30–35 nm size and change in morphology from spherical to elliptical structures upon increasing the film thickness. The optical band gap value of the CdO films decreased from 2.67 to 2.36 eV with increase in the thickness. CdO films were deposited on to interdigitated electrodes to be employed as ammonia (NH{sub 3}) gas sensor. The fabricated CdO sensor with thickness of 294 nm has a capacity to detect NH{sub 3} as low as 50 ppm at a relatively low operating temperature of 150 °C with quick response and recovery time. - Highlights: • Nanostructured CdO films were deposited on to glass substrates using magnetron sputtering. • Deposition time was varied in order to obtain films with different thicknesses. • The CdO films were polycrystalline in nature with preferred orientation along (1 1 1) direction. • The optical bandgap values of the films decreased on increasing the thickness of the films. • CdO films with different thickness such as 122, 204, 294 nm was capable to detect NH{sub 3} down to 50 ppm at operating temperature of 150 °C.

  6. NOVEL TECHNIQUE OF POWER CONTROL IN MAGNETRON TRANSMITTERS FOR INTENSE ACCELERATORS

    Energy Technology Data Exchange (ETDEWEB)

    Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M.; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

    2016-10-21

    A novel concept of a high-power magnetron transmitter allowing dynamic phase and power control at the frequency of locking signal is proposed. The transmitter compensating parasitic phase and amplitude modulations inherent in Superconducting RF (SRF) cavities within closed feedback loops is intended for powering of the intensity-frontier superconducting accelerators. The con- cept uses magnetrons driven by a sufficient resonant (in- jection-locking) signal and fed by the voltage which can be below the threshold of self-excitation. This provides an extended range of power control in a single magnetron at highest efficiency minimizing the cost of RF power unit and the operation cost. Proof-of-principle of the proposed concept demonstrated in pulsed and CW regimes with 2.45 GHz, 1kW magnetrons is discussed here. A conceptual scheme of the high-power transmitter allowing the dynamic wide-band phase and y power controls is presented and discussed.

  7. Dynamic phase-control of a rising sun magnetron using modulated and continuous current

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez-Gutierrez, Sulmer, E-mail: sulmer.a.fernandez.gutierrez@intel.com [Intel Corporation, 2111 NE 25th Ave, Hillsboro, Oregon 97214 (United States); Browning, Jim [Department of Electrical and Computer Engineering, Boise State University, Boise, Idaho 83725 (United States); Lin, Ming-Chieh [Department of Electrical and Biomedical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Smithe, David N. [Tech-X Corporation, 5621 Arapahoe Ave, Boulder, Colorado 80303 (United States); Watrous, Jack [Confluent Sciences, LLC, Albuquerque, New Mexico 87111 (United States)

    2016-01-28

    Phase-control of a magnetron is studied via simulation using a combination of a continuous current source and a modulated current source. The addressable, modulated current source is turned ON and OFF at the magnetron operating frequency in order to control the electron injection and the spoke phase. Prior simulation work using a 2D model of a Rising Sun magnetron showed that the use of 100% modulated current controlled the magnetron phase and allowed for dynamic phase control. In this work, the minimum fraction of modulated current source needed to achieve a phase control is studied. The current fractions (modulated versus continuous) were varied from 10% modulated current to 100% modulated current to study the effects on phase control. Dynamic phase-control, stability, and start up time of the device were studied for all these cases showing that with 10% modulated current and 90% continuous current, a phase shift of 180° can be achieved demonstrating dynamic phase control.

  8. A SMALL UNBALANCED MAGNETRON SPUTTERING SOURCE WITH MULTIPOLE MAGNETIC FIELD ANODE

    Institute of Scientific and Technical Information of China (English)

    郑思孝; 孙官清; 等

    1994-01-01

    A small unbalanced magnetron atom source with multipole cusp magnetic field anode is described.The co-axial magnetron rpinciple is extended to the circular planar magnetron atom source,which raises the efficiency of sputtering target area up to 60%.The multipole magnetic field is put in the anode.which makes the unbalanced magnetron atom source run in a higher discharge current at a lower arc voltage condition.Meanwhile.the sputtering atoms through out the anode can be ionized partially,because the electron reaching the anode have to suffer multiple collisons in order to advance across the multipole magnetic field lines in the anode,which enhances the chemical reactivity of the ejecting atoms in film growth and improve the property of film depositing.

  9. High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency

    Directory of Open Access Journals (Sweden)

    Strýhal Z

    2007-01-01

    Full Text Available AbstractThe article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5 targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency frwas investigated in detail. It was found that the increase of frfrom 100 to 350 kHz leads to (a an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate aDof sputtered TiO2films and (b a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO2films can be sputtered on unheated glass substrates at aD = 80 nm/min, Tsurf < 180 °C when high value of fr = 350 kHz was used. Properties of a thin hydrophilic TiO2film deposited on a polycarbonate substrate are given.

  10. A Compact, Pi-Mode Extraction Scheme for the Axial B-Field Recirculating Planar Magnetron

    Science.gov (United States)

    2012-07-23

    Figure 4). Thus, in a planar magnetron, the minimum phase velocity, vph , to stay above cutoff in the rectangular waveguide is ℎ = ...as magnetrons, electrons must be accelerated such that they are in synchronism with the phase velocity, vph , of the electromagnetic wave for an...is also likely to be a factor in the waveguide power-loading profile data displayed in Figure 10 (a). It is expected that a careful optimization of

  11. Pulsed Power Generators For Two-section Lia Relativistic Magnetron Driver

    CERN Document Server

    Agafonov, A V; Pevchev, V P

    2004-01-01

    Two prototypes of pulsed power generators for a two-sectional LIA - specialized driver of a relativistic magnetron were constructed and tested. The driver for the double-sided powering of a relativistic magnetron consists of two identical sets of induction modules (two sections of LIA) with inner electrodes - vacuum adders connected to both sides of a coaxial magnetron. It provides the symmetric power flowing in a magnetron and a possibility of localising of the electron flow in magnetron interaction region. The first generator designed for a small-scale laboratory installation provides the output pulses of 100 ns in duration with voltage amplitude of 50 kV at repetition rate of 1 pps. The construction of the generator is based on the application of experimental capacitor banks designed as a pulse forming line with the next parameters: charging voltage - 80 kV, impedance - 1,7 Ohm, pulse duration - 80 ns at a matched load. The second generator was designed for 1 MV integrated LIA - magnetron system. It cons...

  12. A Two-stage injection-locked magnetron for accelerators with superconducting cavities

    CERN Document Server

    Kazakevich, Grigory; Flanagan, Gene; Marhauser, Frank; Neubauer, Mike; Yakovlev, Vyacheslav; Chase, Brian; Nagaitsev, Sergey; Pasquinelli, Ralph; Solyak, Nikolay; Tupikov, Vitali; Wolff, Daniel

    2013-01-01

    A concept for a two-stage injection-locked CW magnetron intended to drive Superconducting Cavities (SC) for intensity-frontier accelerators has been proposed. The concept considers two magnetrons in which the output power differs by 15-20 dB and the lower power magnetron being frequency-locked from an external source locks the higher power magnetron. The injection-locked two-stage CW magnetron can be used as an RF power source for Fermilab's Project-X to feed separately each of the 1.3 GHz SC of the 8 GeV pulsed linac. We expect output/locking power ratio of about 30-40 dB assuming operation in a pulsed mode with pulse duration of ~ 8 ms and repetition rate of 10 Hz. The experimental setup of a two-stage magnetron utilising CW, S-band, 1 kW tubes operating at pulse duration of 1-10 ms, and the obtained results are presented and discussed in this paper.

  13. DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS

    Energy Technology Data Exchange (ETDEWEB)

    High Current Electronics Institute, Tomsk, Russia; Anders, Andre; Mendelsberg, Rueben J.; Lim, Sunnie; Mentink, Matthijs; Slack, Jonathan L.; Wallig, Joseph G.; Nollau, Alexander V.; Yushkov, Georgy Yu.

    2011-07-24

    Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm{sup 2}. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and the resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.

  14. Ionized magnetron sputtering of aluminum(,2)oxygen(,3)

    Science.gov (United States)

    Gonzalez, Patrick Fernando

    2000-10-01

    This dissertation shows a detailed study of the conditions necessary for sputtering alumina using a novel variant of ionized magnetron sputtering (IMS) first demonstrated by Yamashita et. al. The study presented herein leverages concurrent research at our laboratory on high density plasmas, plasma characterization and charged particle beams research to demonstrate a new source capable of sputtering hydrated alumina films at high rates. High quality ceramics such as Al2O3 find uses in a variety of applications, and in particular, for mass storage applications. Consequently, there exists an ever-growing need to provide and improve the capability of growing thick insulating films. Ideally, the insulating film should be stoichiometric and able to be grown at rates high enough to be easily manufacturable. Alumina is a particularly attractive due to its high density, Na barrier properties, and stability and radiation resistance. However, high quality films are often difficult to achieve with conventional RF plasma due to extremely slow deposition rates and difficulties associated with system cooling. The preferred method is to reactively sputter Al from a solid target in an O2 ambient. Nevertheless, this process is inherently unstable and leads to arcing and uneven target wear when magnetrons are used. In this study, we build the sputtering source, evaluate, and maximize the deposition characteristics of alumina films sputtered from a solid target in an Ar/O2 ambient. Semi-crystalline (kappa + theta) alumina has been reported using a similar technique at temperatures as low 370 C. The difference in the system used herein is that RF power is used for both, the inductive and capacitive components. Additionally, we use a solid target made of sintered alumina throughout the experiment. A model is developed using regression analysis and compared to results obtained. Because plasma parameters can interact with each other, we explore ICP/CCP power interactions and gas influence

  15. Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Junhua Gao; Lin Zhang; Jinquan Xiao; Jun Gong; Chao Sun; Lishi Wen

    2012-01-01

    The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si films were examined. Numerical simulations of the magnetic field configuration showed that increasing the coil current significantly changed the magnetic field distribution between the substrate and targets. The saturated ion current density Ji in the substrate position measured by using a circular flat probe increased from 0.18 to 0.55 mA/cm2 with the coil current ranging from 0 to 6 A. X-ray diffraction and Raman results revealed that increasing the ion density near the substrate would benefit crystallization of films and the preferential growth along [lI1] orientation. From analysis of the surface morphology and the microstructure of Si films grown under different plasma conditions, it is found that with increasing the Ji, the surface of the film was smoothed and the alteration in the surface roughness was mainly correlated to the localized surface diffusion of the deposited species and the crystallization behavior of the films.

  16. Synthesis of Alumina Thin Films Using Reactive Magnetron Sputtering Method

    Science.gov (United States)

    Angarita, G.; Palacio, C.; Trujillo, M.; Arroyave, M.

    2017-06-01

    Alumina (Al2O3) thin films were deposited on Si (100) by Magnetron Sputtering in reactive conditions between an aluminium target and oxygen 99.99% pure. The plasma was formed employing Argon with an R.F power of 100 W, the dwelling time was 3 hours. 4 samples were produced with temperatures between 350 and 400 ºC in the substrate by using an oxygen flow of 2 and 8 sccm, the remaining parameters of the process were fixed. The coatings and substrates were characterized using Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and Energy Dispersive Spectroscopy (EDS) in order to compare their properties before and after deposition. The films thicknesses were between 47 and 70 nm. The results show that at high oxygen flow the alumina structure prevails in the coatings while at lower oxygen flow only aluminum is deposited in the coatings. It was shown that the temperature increases grain size and roughness while decreasing the thicknesses of the coatings.

  17. On Tomonaga's Theory of Split-Anode Magnetrons

    CERN Document Server

    Dittrich, Walter

    2016-01-01

    This article is meant to formulate the equations of motion of an electron in a cavity magnetron using action-angle variables. This means following the electron's path on its way from a cylindrical cathode moving toward a co-axial cylindrical anode in presence of a uniform magnetic field parallel to the common axis. After analyzing the situation without coupling to an external oscillatory electric field, we employ methods of canonical perturbation theory to find the resonance condition between the frequencies of the free theory w_r, w_phi and the applied perturbing oscillatory frequency w. A long-time averaging process will then eliminate the periodic terms in the equation for the now time-dependent action-angle variables. The terms that are no longer periodic will cause secular changes so that the canonical action-angle variables (J, delta) change in a way that the path of the electron will deform gradually so that it can reach the anode. How the ensemble of the initially randomly distributed electrons forms ...

  18. Crystallographic properties of magnetron sputtered barium ferrite films

    Energy Technology Data Exchange (ETDEWEB)

    Capraro, S. [Laboratoire DIOM, University of Saint-Etienne, 23 rue Michelon, 42023 Saint-Etienne Cedex (France)]. E-mail: stephane.capraro@univ-st-etienne.fr; Berre, M. Le [LPM, UMR 5511, INSA Lyon, 7 av. Jean Capelle, 69621 Villeurbanne Cedex (France); Chatelon, J.P. [Laboratoire DIOM, University of Saint-Etienne, 23 rue Michelon, 42023 Saint-Etienne Cedex (France); Bayard, B. [Laboratoire DIOM, University of Saint-Etienne, 23 rue Michelon, 42023 Saint-Etienne Cedex (France); Joisten, H. [CEA-LETI, 17 rue des martyrs, 38041 Grenoble Cedex (France); Canut, C. [LPMCN, University Lyon I, 43 Bvd. du 11 novembre 1918, 69622 Villerbanne, Cedex (France); Barbier, D. [LPM, UMR 5511, INSA Lyon, 7 av. Jean Capelle, 69621 Villeurbanne Cedex (France); Rousseau, J.J. [Laboratoire DIOM, University of Saint-Etienne, 23 rue Michelon, 42023 Saint-Etienne Cedex (France)

    2004-09-15

    The development of devices combining a ferrite with a semiconductor chip is a major focus of current research. Barium hexaferrite (BaFe{sub 12}O{sub 19} or BaM) thick films are deposited here using a RF magnetron sputtering system. Films are amorphous and non magnetic after deposition. Post-deposition thermal annealing is employed to make the films crystallize. The effects of the substrate, thermal annealing process, thickness, substrate temperature on crystallographic properties and stoichiometry are studied using a X-ray diffractometry (XRD) and Rutherford back-scattering (RBS). The in-depth homogeneity of Ba, Fe and O is evaluated by secondary ion mass spectroscopy (SIMS). The study shows a good crystallization of BaM films and there is a preferential orientation among the crystallographic planes (1 0 1), (2 0 0), (2 0 3), (1 0 2), (1 1 0) and (2 0 5) when BaM films are prepared at low RF power and when the substrate is heated. For several elaboration parameters, grains size is in the range of 25 and 40 nm and BaM films are stoichiometric with regard to the target stoichiometry.

  19. Textured ZnO thin films by RF magnetron sputtering

    CERN Document Server

    Ginting, M; Kang, K H; Kim, S K; Yoon, K H; Park, I J; Song, J S

    1999-01-01

    Textured thin films ZnO has been successfully grown by rf magnetron sputtering method using a special technique of introducing a small amount of water and methanol on the deposition chamber. The grain size of the textured surface is highly dependent on the argon pressure during the deposition. The pressure in this experiment was varied from 50 mTorr down to 5 mTorr and the highest grain size of the film is obtained at 5 mTorr. The total transmittance of the films are more than 85% in the wavelength of 400 to 800 nm, and haze ratio of about 14% is obtained at 400 nm wavelength. Beside the textured surface, these films also have very low resistivity, which is lower than 1.4x10 sup - sup 3 OMEGA centre dot cm. X-ray analysis shows that the films with textured surface have four diffraction peaks on the direction of (110), (002), (101) and (112), while the non-textured films have only (110) and (002) peaks. Due to the excellent characteristics of this film, it will make the film very good TCO alternatives for the ...

  20. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  1. A modified relativistic magnetron with TEM output mode

    Science.gov (United States)

    Shi, Di-Fu; Qian, Bao-Liang; Wang, Hong-Gang; Li, Wei; Ju, Jin-Chuan; Du, Guang-Xing

    2017-01-01

    A modified relativistic magnetron (RM) with TEM output mode is proposed. By setting the coupling slots at the bottom of the resonant cavities in the transmission region rather than in the interaction region, besides possessing the original RM's advantages of high power conversion efficiency and radiating the lowest order mode, the modified RM not only improves the compactness and miniaturization of the magnetic field system, which is beneficial to realize the RMs packed by a permanent magnet, but also improves the robustness of operating frequency to structural perturbations of the coupling slots, which contributes to optimize the RM performance by adjusting the coupling slot dimensions with a relatively stable operating frequency. In the three-dimensional particle-in-cell (PIC) simulation, the modified RM with a reduction of 27.2% in the weight of the coils, 35.8% in the occupied space of the coils, and 18.6% in the operating current, can output a relatively pure TEM mode, which has been demonstrated as the dominant output mode by simulation, corresponding to an output power of 495.0 MW and a power conversion efficiency of 56.4%, at the resonant frequency of 4.30 GHz. In addition, an output power of above 2 GW can also be obtained from the RM in simulations.

  2. Magnetron-sputtered coatings for titanium aluminide alloys

    Energy Technology Data Exchange (ETDEWEB)

    Godlewska, E.; Mitoraj, M.; Mania, R. [AGH-UST, Cracow (Poland). Faculty of Materials Science and Ceramics; Zimowski, S.; Kot, M. [AGH-UST, Cracow (Poland). Faculty of Mechanical Engineering and Robotics

    2010-07-01

    Third-generation titanium aluminide alloys fulfil major requirements as lightweight materials for structural applications at moderate temperatures and loads. They are known for attractive combination of physical, chemical and mechanical properties, e.g. low density, good oxidation resistance and strength. Still a lot of work is being done to develop protection systems enabling their use at temperatures exceeding current limit of about 600-650 C. The protection systems under investigation include thick thermal barriers similar to the state-of-the-art coatings for superalloys but also thin layers functioning as diffusion barriers for gases to prevent embrittlement. The paper presents investigations on surface modification of a ({alpha}+{gamma}{sub 2}) Ti-46-8Nb alloy by means of magnetron sputtering of two-component targets: Cr-0.5Si, Cr-5Si, CrSi{sub 2} and Ti-10Si. Targets were obtained from elemental powders by hot pressing. The properties of thus produced surface layers were evaluated on the basis of nanoindentation and scratch tests in the as-received condition and after exposure to air at elevated temperature. Surfaces and cross-sections of the oxidized specimens were examined by SEM, EDS and XRD/GID. (orig.)

  3. Optical Properties of Magnetron sputtered Nickel Thin Films

    Science.gov (United States)

    Twagirayezu, Fidele; Geerts, Wilhelmus J.; Cui, Yubo

    2015-03-01

    The study of optical properties of Nickel (Ni) is important, given the pivotal role it plays in the semiconductor and nano-electronics technology. Ni films were made by DC and RF magnetron sputtering in an ATC Orion sputtering system of AJA on various substrates. The optical properties were studied ex situ by variable angle spectroscopic (220-1000 nm) ellipsometry at room temperature. The data were modeled and analyzed using the Woollam CompleteEase Software fitting ellipsometric and transmission data. Films sputtered at low pressure have optical properties similar to that of Palik. Films sputtered at higher pressure however have a lower refraction index and extinction coefficient. It is expected from our results that the density of the sputtered films can be determined from the ellipsometric quantities. Our experiments also revealed that Ni is susceptible to a slow oxidation changing its optical properties over the course of several weeks. The optical properties of the native oxide differ from those of reactive sputtered NiO similar as found by. Furthermore the oxidation process of our samples is characterized by at least two different time constants.

  4. Preparation of iron cobaltite thin films by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Le Trong, H. [Université de Toulouse, UPS, INPT, Institut Carnot CIRIMAT, 118, Route de Narbonne, F-31062 Toulouse cedex 9 (France); CNRS, Institut Carnot Cirimat, F-31062 Toulouse (France); Ho Chi Minh City University of Science, Vietnam National University Ho Chi Minh City, 227 Nguyen Van Cu Q 5, 750000 Ho Chi Minh City (Viet Nam); Bui, T.M.A. [Université de Toulouse, UPS, INPT, Institut Carnot CIRIMAT, 118, Route de Narbonne, F-31062 Toulouse cedex 9 (France); CNRS, Institut Carnot Cirimat, F-31062 Toulouse (France); University of Transport and Communications, Lang Thuong, Dong Da, Hanoi (Viet Nam); Presmanes, L., E-mail: presmane@chimie.ups-tlse.fr [Université de Toulouse, UPS, INPT, Institut Carnot CIRIMAT, 118, Route de Narbonne, F-31062 Toulouse cedex 9 (France); CNRS, Institut Carnot Cirimat, F-31062 Toulouse (France); Barnabé, A.; Pasquet, I.; Bonningue, C.; Tailhades, Ph. [Université de Toulouse, UPS, INPT, Institut Carnot CIRIMAT, 118, Route de Narbonne, F-31062 Toulouse cedex 9 (France); CNRS, Institut Carnot Cirimat, F-31062 Toulouse (France)

    2015-08-31

    Iron cobaltite thin films with spinel structure have been elaborated by radio-frequency (RF) magnetron sputtering from a Co{sub 1.75}Fe{sub 1.25}O{sub 4} target. Influence of argon pressure on structure, microstructure and physical properties of films has been examined. Iron–cobalt oxide thin films essentially consist of one spinel phase when deposited at low pressure (0.5 and 1.0 Pa). At high pressure (2.0 Pa), the global stoichiometry of the film is changed which results in the precipitation of a mixed monoxide of cobalt and iron beside the spinel phase. This in-situ reduction due to an oxygen loss occurring mainly at high deposition pressure has been revealed by X-ray diffraction and Raman spectroscopy. Microstructural evolution of thin film with argon pressure has been shown by microscopic observations (AFM and SEM). The evolution of magnetic and electrical properties, versus argon pressure, has been also studied by SQUID and 4 point probe measurements. - Highlights: • Co{sub 1.75}Fe{sub 1.25}O{sub 4} phase is obtained at room temperature without any annealing. • This phase is a ferrimagnetic semiconductor with a coercive field of 32 kOe at 5 K. • Oxygen content of the thin film is related to the argon pressure during sputtering. • Monoxide phase grows into the film at high argon pressure. • Magnetic coupling effect reveals nanoscale impurities at low argon pressure.

  5. Application of 60 mmphi superconducting bulk magnet to magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Matsuda, T.; Kashimoto, S.; Imai, A.; Yanagi, Y.; Itoh, Y.; Ikuta, H.; Mizutani, U.; Sakurai, K.; Hazama, H

    2003-10-15

    We constructed the planar magnetron sputtering apparatus using a c-axis oriented single-domain Sm123 bulk superconductor with 60 mm in diameter as a very powerful magnet in place of an ordinary Nd-Fe-B magnet. A high magnetic field of 4.2 T at the surface of the superconductor coupled with a high target voltage of maximum 6 kV enabled us to discharge even at pressure of 1 x 10{sup -3} Pa. A target-to-substrate distance of 300 mm was successfully employed under low pressures of 10{sup -2}-10{sup -3} Pa to make the deposition of almost contamination-free films feasible. The simulation software (JMAG) was used to optimize the magnetic circuit configurations. The simulations could reproduce well the distribution of the magnetic field above the target measured by a three-axial Hall sensor. The discharging characteristics of Cu, Ni and Fe targets in the pressure range over 10{sup -1}-10{sup -3} Pa were studied under different target voltages. The deposition rates of 0.063 nm/s (or 38 Angst/min) and 0.013 nm/s (or 8 Angst/min) were achieved for Cu and Fe targets with 3 mm in thickness, respectively, under the Ar pressure of 6.6 x 10{sup -2} Pa (or 4.9 x 10{sup -4} Torr)

  6. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Ciudad Universitaria, Carrera 30 Numero 45-03, Bogota (Colombia); Huerta, L. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)], E-mail: ser42@iim.unam.mx; Escamilla, R. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)

    2008-10-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T{sub C}). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T{sub C} values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T{sub C} was correlated to a higher contribution of the N 2p states.

  7. Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

    Energy Technology Data Exchange (ETDEWEB)

    Ait Aissa, K.; Achour, A., E-mail: a_aminph@yahoo.fr; Camus, J.; Le Brizoual, L.; Jouan, P.-Y.; Djouadi, M.-A.

    2014-01-01

    Aluminium nitride (AlN) films were deposited by dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) on (100) oriented silicon (Si) substrates, in Ar–N{sub 2} gas mixture, at different working pressures. The films were characterized using X-ray diffraction (XRD), profilometer and transmission electron microscopy (TEM). The effect of the sputtering pressure on the structure, the residual stress and the deposition rate of AlN films deposited by the two processes (dcMS and HiPIMS) was investigated. It was found that the deposition rate is always lower in HiPIMS compared to dcMS. The AlN films are textured along (002) direction in both cases of dcMS and HiPIMS as it is indicated by XRD measurements, with residual stresses which are more important in the case of films deposited by HiMIPS. These residual stresses decrease with the sputtering pressure increase, especially in the case of the films deposited by HiPIMS. TEM analyses have shown a local epitaxial growth of AlN on the Si substrate which would favour thermal evacuation improvement of AlN as thermal interface material. - Highlights: • Highly c-axis oriented AlN films were obtained. • dc magnetron sputtering and high power impulse magnetron sputtering (HiMIPS) were used. • Abrupt interface between AlN and silicon substrate was obtained by HiPIMS.

  8. New Simulation Method of New HV Power Supply for Industrial Microwave Generators with N=2 Magnetrons

    Directory of Open Access Journals (Sweden)

    N. El Ghazal

    2013-01-01

    Full Text Available This original work treats a new simulation method of a new type of high voltage power supply for microwave generators with N magnetrons (treated case: N=2 magnetrons, used as a source of energy in the industrial applications. This new power supply is composed of a single-phase HV transformer with magnetic leakage flow, supplying two parallel cells, which multiplies the voltage and stabilizes the current. The doubler supplies one magnetron. The transformer is presented by its p equivalent circuit. Each inductance of the model is characterized by its relation "flow-current". In this paper, we present a new approach validation of the p model of the special transformer using Matlab-Simulink code. The theoretical results compared with the experimental measurements, is in good agreement with them. The use of this tool Matlab-Simulink, has allowed us to confirm the possibility of the operation of this new system without interaction between magnetrons, with a view to a possible optimization which lead to reduce the weight, the volume and the cost of implementation while ensuring the process of regulating the current in each magnetron.

  9. Comparative Study of Cu Films Prepared by DC, High-Power Pulsed and Burst Magnetron Sputtering

    Science.gov (United States)

    Solovyev, A. A.; Oskirko, V. O.; Semenov, V. A.; Oskomov, K. V.; Rabotkin, S. V.

    2016-08-01

    A comparative study of deposition rate, adhesion, structural and electrical properties of nanocrystalline copper thin films deposited using direct current magnetron sputtering (DCMS) and different regimes of high power pulsed magnetron sputtering is presented. High-power impulse magnetron sputtering (HIPIMS) and burst regime (pulse packages) of magnetron sputtering are investigated. The ion and atomic flows toward the growing film during magnetron sputtering of a Cu target are determined. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used to observe the structural characterization of the films. The resistivity of the films was measured using four-point probe technique. In all sputtering regimes, Cu films have mixture crystalline orientations of [111], [200], [311] and [220] in the direction of the film growth. As peak power density in studied deposition regimes was different in order of magnitude (from 15 W/cm2 in DC regime to 3700 W/cm2 in HIPIMS), film properties were also greatly different. DCMS Cu films exhibit a porous columnar grain structure. In contrast, HIPIMS Cu films have a slightly columnar and denser composition. Cu films deposited using burst regimes at peak power density of 415 W cm-2 and ion-to-atom ratio of about 5 have the densest composition and smallest electrical resistance.

  10. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  11. Theoretical investigation of resonant frequencies of unstrapped magnetron with arbitrary side resonators

    Energy Technology Data Exchange (ETDEWEB)

    Yue, Song, E-mail: yuessd@163.com [Key Laboratory of High Power Microwave Sources and Technologies, Institute of Electronics, Chinese Academy of Sciences, Beijing 100190 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Zhang, Zhao-chuan; Gao, Dong-ping [Key Laboratory of High Power Microwave Sources and Technologies, Institute of Electronics, Chinese Academy of Sciences, Beijing 100190 (China)

    2015-04-15

    In this paper, a sector steps approximation method is proposed to investigate the resonant frequencies of magnetrons with arbitrary side resonators. The arbitrary side resonator is substituted with a series of sector steps, in which the spatial harmonics of electromagnetic field are also considered. By using the method of admittance matching between adjacent steps, as well as field continuity conditions between side resonators and interaction regions, the dispersion equation of magnetron with arbitrary side resonators is derived. Resonant frequencies of magnetrons with five common kinds of side resonators are calculated with sector steps approximation method and computer simulation softwares, in which the results have a good agreement. The relative error is less than 2%, which verifies the validity of sector steps approximation method.

  12. Magnetron sputtering of copper on thermosensitive polymer materials of the gas centrifuge rotors

    Science.gov (United States)

    Borisevich, V.; Senchenkov, S.; Titov, D.

    2016-09-01

    Magnetron sputtering is the well-known and widely-used deposition technique for coating versatile high-quality and well-adhered films. However, the technology has some limitations, caused by high temperatures on the coating surface. The paper is devoted to the experimental development of a process of magnetron sputtering of copper on a surface coated with a thermosensitive polymer made of carbon fiber with epoxide binder. This process is applied for balancing a rotor of a gas centrifuge for isotope separation. The optimum operating parameters of the process are found and discussed. They were in quantitative agreement with data obtained by means of non-stationary modeling based on a global description of plasma in the typical geometry of the magnetron discharges obtained in independent research. The structure of the resulting layer is investigated.

  13. Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

    Science.gov (United States)

    Yuan, Xiaohong; Xu, Wenzheng; Huang, Fenglin; Chen, Dongsheng; Wei, Qufu

    2016-12-01

    Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag2O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

  14. Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

    CERN Document Server

    Ellmer, K; Weiss, V; Rossner, H

    2001-01-01

    A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3 deg. and 10 deg., is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

  15. Microwave impedance matching strategies of an applicator supplied by a bi-directional magnetron waveguide launcher.

    Science.gov (United States)

    Roussy, Georges; Kongmark, Nils

    2003-01-01

    It is shown that a bi-directional waveguide launcher can be used advantageously for reducing the reflection coefficient mismatch of an input impedance of an applicator. In a simple bi-directional waveguide launcher, the magnetron is placed in the waveguide and generates a nominal field distribution with significant output impedance in both directions of the waveguide. If a standing wave is tolerated in the torus, which connects the launcher and the applicator, the power transfer from the magnetron to the applicator can be optimal, without using special matching devices. It is also possible to match the bi-directional launcher with two inductance stubs near the antenna of the magnetron and use them for supplying a two-input applicator without reflection.

  16. Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering

    CERN Document Server

    Andersson, Joakim; Anders, André

    2014-01-01

    The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by high power impulse magnetron sputtering.

  17. Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

    Energy Technology Data Exchange (ETDEWEB)

    Chan, K.-Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)], E-mail: k.y.chan@fz-juelich.de; Luo, P.-Q.; Zhou, Z.-B. [Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, 200240 Shanghai (China); Tou, T.-Y.; Teo, B.-S. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2009-03-01

    Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.

  18. Installation and commissioning of the new Fermi National Accelerator Laboratory H- Magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Bollinger, D. S., E-mail: bollinger@fnal.gov [Proton Source Department, Fermi National Accelerator Laboratory, Batavia, Illinois 60510 (United States)

    2014-02-15

    The Fermi National Accelerator Laboratory (FNAL) 40 year old Cockcroft-Walton 750 keV injectors with slit aperture magnetron ion sources have been replaced with a circular aperture magnetron, Low Energy Beam Transport, Radio Frequency Quadrupole Accelerator, and Medium Energy Beam Transport, as part of the FNAL Proton Improvement Plan. The injector design is based on a similar system at Brookhaven National Laboratory. The installation, commissioning efforts, and source operations to date will be covered in this paper along with plans for additional changes to the original design to improve reliability by reducing extractor spark rates and arc current duty factor.

  19. High frequency pulse anodising of magnetron sputtered Al–Zr and Al–Ti Coatings

    DEFF Research Database (Denmark)

    Gudla, Visweswara Chakravarthy; Bordo, Kirill; Engberg, Sara

    2016-01-01

    High frequency pulse anodising of Al–Zr and Al–Ti coatings is studied as a surface finishing technique and compared to conventional decorative DC anodising. The Al–Zr and Al–Ti coatings were deposited using DC magnetron sputtering and were heat treated after deposition to generate a multiphase mi...

  20. Fabrication of nanogradient coatings for laser devices using the method of magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Abramov, N F; Volpyan, O D; Obod, Yu A [Open Joint-Stock Company M.F. Stel' makh Polyus Research Institute, Moscow (Russian Federation); Dronskii, R V [' Fotron-Auto' Scientific Manufacture Enterprise, Moscow (Russian Federation)

    2013-09-30

    Significant advantages of the magnetron sputtering method for producing complex high-quality optical coatings for laser devices are shown. Technology aspects of efficient fabrication of such coatings are considered. The capabilities of the developed automated technological and control equipment are described. (nanogradient dielectric coatings and metamaterials)

  1. A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

    Science.gov (United States)

    Raman, Priya; Weberski, Justin; Cheng, Matthew; Shchelkanov, Ivan; Ruzic, David N.

    2016-10-01

    High Power Impulse Magnetron Sputtering (HiPIMS) is one of the recent developments in the field of magnetron sputtering technology that is capable of producing high performance, high quality thin films. Commercial implementation of HiPIMS technology has been a huge challenge due to its lower deposition rates compared to direct current Magnetron Sputtering. The cylindrically symmetric "TriPack" magnet pack for a 10 cm sputter magnetron that was developed at the Center for Plasma Material Interactions was able to produce higher deposition rates in HiPIMS compared to conventional pack HiPIMS for the same average power. The "TriPack" magnet pack in HiPIMS produces superior substrate uniformity without the need of substrate rotation in addition to producing higher metal ion fraction to the substrate when compared to the conventional pack HiPIMS [Raman et al., Surf. Coat. Technol. 293, 10 (2016)]. The films that are deposited using the "TriPack" magnet pack have much smaller grains compared to conventional pack DC and HiPIMS films. In this paper, the reasons behind the observed increase in HiPIMS deposition rates from the TriPack magnet pack along with a modified particle flux model is discussed.

  2. Advanced TiC/a-C : H nanocomposite coatings deposited by magnetron sputtering

    NARCIS (Netherlands)

    Pei, Y.T.; Galvan, D.; Hosson, J.Th.M. De; Strondl, C.

    2006-01-01

    TiC/a-C:H nanocomposite coatings have been deposited by magnetron Sputtering. They consist of 2-5 nm TiC nanocrystallites embedded in the amorphous hydrocarbon (a-C:H) matrix. A transition from a Columnar to a glassy microstructure has been observed in the nanocomposite coatings with increasing subs

  3. Surface treatment of polyimide film for metal magnetron deposition in vacuum

    Science.gov (United States)

    Petrov, V.; Vertyanov, D.; Timoshenkov, S.; Nikolaev, V.

    2014-12-01

    This paper brings forward a solution for acquisition of good quality metallization layers on the polyimide substrate by magnetron deposition in vacuum environment. Different film type structures have been analyzed after refining and activation surface treatment operations. Positive effect was shown after the application of polyimide lacquer for surface dielectric film planarization and for structural defects elimination.

  4. Investigation of photocatalytic activity of titanium dioxide deposited on metallic substrates by DC magnetron sputtering

    DEFF Research Database (Denmark)

    Daviðsdóttir, Svava; Canulescu, Stela; Dirscherl, Kai

    2013-01-01

    The photocatalytic properties of titanium dioxide (TiO2) coating in the anatase crystalline structure deposited on aluminium AA1050 alloy and stainless steel S316L substrates were investigated. The coating was prepared by DC magnetron sputtering. The microstructure and surface morphology...

  5. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    NARCIS (Netherlands)

    Rafieian, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

    2015-01-01

    We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to an

  6. Characterization of magnetron-sputtered partially ionized deposition as a function of metal and gas species

    Energy Technology Data Exchange (ETDEWEB)

    Allain, Monica M. C. [University of Illinois, Urbana, Illinois 61801 (United States); Hayden, D. B. [University of Illinois, Urbana, Illinois 61801 (United States); Juliano, D. R. [University of Illinois, Urbana, Illinois 61801 (United States); Ruzic, D. N. [University of Illinois, Urbana, Illinois 61801 (United States)

    2000-05-01

    Conventional magnetron sputter deposition with a rf inductively coupled plasma (ICP) has demonstrated that ionized metal fluxes can be effectively utilized to fill trenches and vias with high aspect ratios. The ICP is created with a seven turn (1/2 wavelength), water cooled coil located between the magnetron cathode and the substrate. A large fraction of the metal atoms sputtered from the magnetron cathode are ionized by the ICP. These ions are accelerated across the sheath toward the substrate and deposited at normal incidence, by placing a negative bias on the substrate. A gridded energy analyzer configured with a quartz crystal microbalance is located in the center of the substrate plane to determine the ion and neutral deposition rates. While keeping the magnetron power, rf coil, target to substrate distance, pressure and diagnostic location constant, the ionization fraction was measured for two metal targets: Cu and Ti using three different working gases: Kr, Ar and Ne. Variations in target materials and working gases are shown to have an effect on ionization and deposition rates. The ionization rate is a sensitive function of the metal's ionization potential. The electron energy distribution in the plasma is affected by the sputtered metal and the working gases' ionization potential. (c) 2000 American Vacuum Society.

  7. A novel DC Magnetron sputtering facility for space research and synchrotron radiation optics

    DEFF Research Database (Denmark)

    Hussain, A.M.; Christensen, Finn Erland; Pareschi, G.;

    1998-01-01

    A new DC magnetron sputtering facility has been build up at the Danish Space Research Institute (DSRI), specially designed to enable uniform coatings of large area curved optics, such as Wolter-I mirror optics used in space telescopes and curved optics used in synchrotron radiation facilities...

  8. Optimization of Ta2O5 optical thin film deposited by radio frequency magnetron sputtering.

    Science.gov (United States)

    Shakoury, R; Willey, Ronald R

    2016-07-10

    Radio frequency magnetron sputtering has been used here to find the parameters at which to deposit Ta2O5 optical thin films with negligible absorption in the visible spectrum. The design of experiment methodology was employed to minimize the number of experiments needed to find the optimal results. Two independent approaches were used to determine the index of refraction n and k values.

  9. Magnetron sputtering system stabilisation for high rate desposition of AlN films

    DEFF Research Database (Denmark)

    Fomin, A; Akhmatov, Vladislav; Selishchev, S

    1998-01-01

    The stabilisation of a planar magnetron sputtering system for reactive sputtering of AlN in a gaseous mixture of Ar and highly active NH3 was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition of c...

  10. High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)

    2015-01-01

    Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films.

  11. The morphology of mass selected ruthenium nanoparticles from a magnetron-sputter gas-aggregation source

    DEFF Research Database (Denmark)

    Nielsen, Rasmus Munksgård; Murphy, Shane; Strebel, Christian Ejersbo

    2010-01-01

    We have investigated the morphology of mass selected ruthenium nanoparticles produced with a magnetron-sputter gas-aggregation source. The nanoparticles are mass selected using a quadrupole mass filter, resulting in narrow size distributions and average diameters between 2 and 15 nm. The particle...

  12. Advanced, phase-locked, 100 kW, 1.3 GHz magnetron

    Science.gov (United States)

    Read, Michael; Ives, R. Lawrence; Bui, Thuc; Pasquinelli, Ralph; Chase, Brian; Walker, Chris; Conant, Jeff

    2017-03-01

    Calabazas Creek Research, Inc., in collaboration with Fermilab and Communications & Power Industries, LLC, is developing a phase-locked, 100 kW peak, 10 kW average power magnetron-based RF system for driving accelerators. Phase locking will be achieved using an approach originating at Fermilab that includes control of both amplitude and phase on a fast time scale.

  13. Microstructural evolution of TiC/a-C nanocomposite coatings with pulsed magnetron sputtering

    NARCIS (Netherlands)

    Pei, Y. T.; Shaha, K. P.; Chen, C. Q.; De Hosson, J. Th. M.; Bradley, J. W.; Voronin, S.; Cada, M.; DeHosson, JTM; Brebbia, CA; Nishida, SI

    2007-01-01

    The microstructure and property of magnetron Sputtered coatings are strongly affected by the intensity of concurrent ion impingement, in particular, by the energy distribution of impinging ions and the flux ratio between impinging ions and depositing atoms. In this paper, we report some striking res

  14. Fabrication of the structures with autocatalytic CdTe nanowires using magnetron sputtering deposition

    Science.gov (United States)

    Soshnikov, I. P.; Semenov, A. A.; Belyavskii, P. Yu.; Shtrom, I. V.; Kotlyar, K. P.; Lysak, V. V.; Kudryashov, D. A.; Pavlov, S. I.; Nashchekin, A. V.; Cirlin, G. E.

    2016-12-01

    We report the possibility of autocatalytic synthesis of highly crystalline perfect CdTe nanowires by magnetron presputtering deposition through the windows in ultrathin layers of SiO2. The photoluminescence spectra of obtained CdTe nanowires exhibit an emission band in the 1.4-1.7 eV region, indicating crystalline perfection of the nanowires.

  15. Optical properties of diamond like carbon films containing copper, grown by high power pulsed magnetron sputtering and direct current magnetron sputtering: Structure and composition effects

    Energy Technology Data Exchange (ETDEWEB)

    Meškinis, Š., E-mail: sarunas.meskinis@ktu.lt; Čiegis, A.; Vasiliauskas, A.; Šlapikas, K.; Tamulevičius, T.; Tamulevičienė, A.; Tamulevičius, S.

    2015-04-30

    In the present study chemical composition, structure and optical properties of hydrogenated diamond like carbon films containing copper (DLC:Cu films) deposited by reactive magnetron sputtering were studied. Different modes of deposition — direct current (DC) sputtering and high power pulsed magnetron sputtering (HIPIMS) as well as two configurations of the magnetron magnetic field (balanced and unbalanced) were applied. X-ray diffractometry, Raman scattering spectroscopy, energy-dispersive X-ray spectroscopy and atomic force microscopy were used to study the structure and composition of the films. It was shown that by using HIPIMS mode contamination of the cathode during the deposition of DLC:Cu films can be suppressed. In all cases oxygen atomic concentration in the films was in 5–10 at.% range and it increased with the copper atomic concentration. The highest oxygen content was observed in the films deposited employing low ion/neutral ratio balanced DC magnetron sputtering process. According to the analysis of the parameters of Raman scattering spectra, sp{sup 3}/sp{sup 2} bond ratio decreased with the increase of Cu atomic concentration in the DLC films. Clear dependence of the extinction, absorbance and reflectance spectra on copper atomic concentration in the films was observed independently of the method of deposition. Surface plasmon resonance effect was observed only when Cu atomic concentration in DLC:Cu film was at least 15 at.%. The maximum of the surface plasmon resonance peak of the absorbance spectra of DLC:Cu films was in 600–700 nm range and redshifted with the increase of Cu amount. The ratio between the intensities of the plasmonic peak and hydrogenated amorphous carbon related peak at ~ 220 nm both in the extinction and absorbance spectra as well as peak to background ratio of DLC:Cu films increased linearly with Cu amount in the investigated 0–40 at.% range. Reflectance of the plasmonic DLC:Cu films was in 30–50% range that could be

  16. Dynamic magnetron sputter process for front metallisation of crystalline silicon solar cells; Dynamisches Magnetron-Sputterverfahren zur Vorderseitenmetallisierung kristalliner Silicium-Solarzellen

    Energy Technology Data Exchange (ETDEWEB)

    Reinwand, Dirk

    2012-07-01

    An alternative high-efficiency front metallisation concept for industrial applications was to be developed. Development goals were, e.g., reduced shading and low contact resistance between the metal and semiconductor. Another advantage is the high flexibility with regard to metals, so that specific demands can be met (e.g. diffusion barrier, adhesive properties). Apart from various methods for characterisation of the layer properties (structure, layer thickness, resistance), also various aspects of energy influx into the substrate are discussed in detail. The generation of soft X-radiation by dynamic magnetron sputtering is investigated, and the existence of soft X-radiation could be proved for the first time using diode current measurement and flat field spectroscopy. Until recently, when SiO2 was used as passivation layer for solar cells, damage was attributed to short-wave radiation. Now, it could be proved that the SiO2 is damaged by the soft X-radiation observed. On the basis of the findings, the first high-efficiency solar cells with sputtered and galvanically reinforced front contacts were constructed. Efficiencies up to 21.1 % were obtained, which illustrates the high potential of the magnetron sputtering process for front metallisation of crystalline Si solar cells. [German] Diese Arbeit beschaeftigt sich mit dem dynamischen Magnetron-Sputterverfahren zur Vorderseitenmetallisierung kristalliner Silicium-Solarzellen. Hierbei sollte ein alternatives, industrietaugliches Vorderseitenmetallisierungskonzept mit hohem Wirkungsgradpotential entwickelt werden. Vorteile gegenueber der Siebdrucktechnologie (als Standardstandverfahren zur Vorderseiten-metallisierung fuer Industriesolarzellen) ergeben sich beispielsweise aus einer reduzierten Abschattung und geringen Kontaktwiderstaenden zwischen Metall und Halbleiter. Ein weiterer Vorteil bei der Verwendung der Kathodenzerstaeubung zur Abscheidung metallischer Schichten ist die hohe Flexibilitaet bezueglich der Wahl

  17. Dual Income Taxes

    DEFF Research Database (Denmark)

    Sørensen, Peter Birch

    This paper discusses the principles and practices of dual income taxation in the Nordic countries. The first part of the paper explains the rationale and the historical background for the introduction of the dual income tax and describes the current Nordic tax practices. The second part...... of the paper focuses on the problems of taxing income from small businesses and the issue of corporate-personal tax integration under the dual income tax, considering alternative ways of dealing with these challenges. In the third and final part of the paper, I briefly discuss whether introducing a dual income...... tax could be relevant for New Zealand....

  18. Dual Income Taxes

    DEFF Research Database (Denmark)

    Sørensen, Peter Birch

    This paper discusses the principles and practices of dual income taxation in the Nordic countries. The first part of the paper explains the rationale and the historical background for the introduction of the dual income tax and describes the current Nordic tax practices. The second part...... of the paper focuses on the problems of taxing income from small businesses and the issue of corporate-personal tax integration under the dual income tax, considering alternative ways of dealing with these challenges. In the third and final part of the paper, I briefly discuss whether introducing a dual income...... tax could be relevant for New Zealand....

  19. Dual-fuel, dual-throat engine preliminary analysis

    Science.gov (United States)

    Obrien, C. J.

    1979-01-01

    A propulsion system analysis of the dual fuel, dual throat engine for launch vehicle applications was conducted. Basic dual throat engine characterization data were obtained to allow vehicle optimization studies to be conducted. A preliminary baseline engine system was defined.

  20. The Dual Career Family.

    Science.gov (United States)

    Gurtin, Lee

    1980-01-01

    The dual career couple is forced to make a series of choices and compromises that impact the realms of marriage and career. The dilemmas that confront dual career marriages can be overcome only by compromise, accommodation, and mutual understanding on the part of the individuals involved. A revamping of human resources and recruitment programs is…

  1. Dual Credit Report

    Science.gov (United States)

    Light, Noreen

    2016-01-01

    In 2015, legislation to improve access to dual-credit programs and to reduce disparities in access and completion--particularly for low income and underrepresented students--was enacted. The new law focused on expanding access to College in the High School but acknowledged issues in other dual-credit programs and reinforced the notion that cost…

  2. Dual Youla parameterization

    DEFF Research Database (Denmark)

    Niemann, Hans Henrik

    2003-01-01

    A different aspect of using the parameterisation of all systems stabilised by a given controller, i.e. the dual Youla parameterisation, is considered. The relation between system change and the dual Youla parameter is derived in explicit form. A number of standard uncertain model descriptions are...

  3. Self-Dual Gravity

    CERN Document Server

    Krasnov, Kirill

    2016-01-01

    Self-dual gravity is a diffeomorphism invariant theory in four dimensions that describes two propagating polarisations of the graviton and has a negative mass dimension coupling constant. Nevertheless, this theory is not only renormalisable but quantum finite, as we explain. We also collect various facts about self-dual gravity that are scattered across the literature.

  4. Optical dual self functions

    Institute of Scientific and Technical Information of China (English)

    华建文; 刘立人; 王宁

    1997-01-01

    A recipe to construct the exact dual self-Fourier-Fresnel-transform functions is shown, where the Dirac comb function and transformable even periodic function are used. The mathematical proof and examples are given Then this kind of self-transform function is extended to the feasible optical dual self-transform functions.

  5. Dual doubled geometry

    NARCIS (Netherlands)

    Bergshoeff, Eric A.; Riccioni, Fabio; Alvarez-Gaumé, L.

    2011-01-01

    We probe doubled geometry with dual fundamental branes. i.e. solitons. Restricting ourselves first to solitonic branes with more than two transverse directions we find that the doubled geometry requires an effective wrapping rule for the solitonic branes which is dual to the wrapping rule for fundam

  6. Research on Dual Control

    Institute of Scientific and Technical Information of China (English)

    Duan Li; Fucai Qian; Peilin Fu

    2005-01-01

    This paper summarizes recent progress by the authors in developing two solution frameworks for dual control. The first solution framework considers a class of dual control problems where there exists a parameter uncertainty in the observation equation of the LQG problem. An analytical active dual control law is derived by a variance minimization approach. The issue of how to determine an optimal degree of active learning is then addressed, thus achieving an optimality for this class of dual control problems. The second solution framework considers a general class of discrete-time LQG problems with unknown parameters in both state and observation equations. The best possible (partial) closed-loop feedback control law is derived by exploring the future nominal posterior probabilities, thus taking into account the effect of future learning when constructing the optimal nominal dual control.

  7. The auroral and ionospheric flow signatures of dual lobe reconnection

    Directory of Open Access Journals (Sweden)

    S. M. Imber

    2006-11-01

    Full Text Available We present the first substantial evidence for the occurrence of dual lobe reconnection from ionospheric flows and auroral signatures. The process of dual lobe reconnection refers to an interplanetary magnetic field line reconnecting with lobe field lines in both the northern and southern hemispheres. Two bursts of sunward plasma flow across the noon portion of the open/closed field line boundary (OCB, indicating magnetic flux closure at the dayside, were observed in SuperDARN radar data during a period of strongly northward IMF. The OCB is identified from spacecraft, radar backscatter, and auroral observations. In order for dual lobe reconnection to take place, we estimate that the interplanetary magnetic field clock angle must be within ±10° of zero (North. The total flux crossing the OCB during each burst is small (1.8% and 0.6% of the flux contained within the polar cap for the two flows. A brightening of the noon portion of the northern auroral oval was observed as the clock angle passed through zero, and is thought to be due to enhanced precipitating particle fluxes due to the occurrence of reconnection at two locations along the field line. The number of solar wind protons captured by the flux closure process was estimated to be ~2.5×1030 (4 tonnes by mass, sufficient to populate the cold, dense plasma sheet observed following this interval.

  8. X-band Linac for a 6 MeV dual-head radiation therapy gantry

    Science.gov (United States)

    Lee, Seung Hyun; Shin, Seung-Wook; Lee, Jongchul; Kim, Hui-Su; Lee, Byeong-No; Lee, Byung-Chul; Park, Hyung-dal; Song, Ki-back; Song, Ho-seung; Mun, Sangchul; Ha, Donghyup; Chai, Jong-Seo

    2017-04-01

    We developed a design for a 6 MeV X-band linear accelerator for radiation therapy in a dual-head gantry layout. The dual-head gantry has two linacs that can be operated independently. Each X-band linac accelerates electron bunches using high-power RF and generates X-rays for radiation therapy. It requires a versatile RF system and pulse sequence to accomplish various radiation therapy procedures. The RF system consists of 9.3 GHz, 2 MW X-band magnetron and associated RF transmission components. A test linac was assembled and operated to characterize its RF performance without beam. This paper presents these results along with a description of the gantry linacs and their operational requirements.

  9. Microstructural Comparisons of Ultra-Thin Cu Films Deposited by Ion-Beam and dc-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Prater, W.

    2004-11-04

    We report and contrast both the electrical resistance and the microstructure of copper thin films deposited in an oxygen containing atmosphere by ion-beam and dc-magnetron sputtering. For films with thicknesses 5 nm or less, the resistivity of the Cu films is minimized at oxygen concentrations ranging from 0.2% to 1% for dc-magnetron sputtering and 6% to 10% for ion beam sputtering. Films sputtered under both conditions show a similar decrease of interface roughness with increasing oxygen concentration, although the magnetron deposited films are smoother. The dc-magnetron produced films have higher resistivity, have smaller Cu grains, and contain a higher concentration of cuprous oxide particles. We discuss the mechanisms leading to the grain refinement and the consequent reduced resistivity in both types of films.

  10. Radio-frequency-magnetron-sputtered CdS/CdTe solar cells on soda-lime glass

    Energy Technology Data Exchange (ETDEWEB)

    Shao, M.; Fischer, A.; Grecu, D.; Jayamaha, U.; Bykov, E.; Contreras-Puente, G.; Bohn, R.G.; Compaan, A.D. [Department of Physics and Astronomy and Center for Materials Science and Engineering, The University of Toledo, Toledo, Ohio 43606 (United States)

    1996-11-01

    We report the fabrication of an 11.6{percent} efficient, polycrystalline thin-film CdS/CdTe solar cell in which both semiconductor layers were deposited by planar-magnetron-radio-frequency sputtering at 380{degree}C on commercially available soda-lime float-glass substrates coated with SnO{sub 2}:F. We show that the magnetron magnetic field is critical to obtaining high cell efficiency. Much stronger photoluminescence and higher electrical conductivity are found in films and cells grown with unbalanced-field magnetrons. The magnetic field dependence is interpreted as arising from the enhanced electron and ion bombardment of the film growth interface when unbalanced magnetrons are used. {copyright} {ital 1996 American Institute of Physics.}

  11. Characterization of high power impulse magnetron sputtering discharges

    Science.gov (United States)

    Hala, Matej

    Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution—time- and species-resolved plasma imaging—employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 µs long non-reactive HiPIMS discharges using a Cr target. Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 µs long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere. Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 µs long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and

  12. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  13. Study on the influence of the magnetron power supply on the properties of the Silicon Nitride films

    Science.gov (United States)

    Kiseleva, D. V.; Yurjev, Y. N.; Petrakov, Y. V.; Sidelev, D. V.; Korzhenko, D. V.; Erofeev, E. V.

    2017-01-01

    Silicon nitride (Si3N4) films were deposited by magnetron sputtering of silicon target in (Ar+N2) atmosphere with refractive index 1.95 - 2.05. The results of Fourier transform infrared (FTIR) spectrophotometry showed Si-N bonds in the thin films with concentration 2.41·1023 – 3.48·1023 cm-3. Dependences of deposition rate, optical characteristics and surface morphology on rate of N2 flow and properties of magnetron power supply.

  14. Optical and Chemical Properties of Mixed-valent Rhenium Oxide Films Synthesized by Reactive DC Magnetron Sputtering

    Science.gov (United States)

    2015-04-03

    AFRL-RX-WP-JA-2015-0178 OPTICAL AND CHEMICAL PROPERTIES OF MIXED- VALENT RHENIUM OXIDE FILMS SYNTHESIZED BY REACTIVE DC MAGNETRON...To) 06 May 2010 – 16 March 2015 4. TITLE AND SUBTITLE OPTICAL AND CHEMICAL PROPERTIES OF MIXED-VALENT RHENIUM OXIDE FILMS SYNTHESIZED BY REACTIVE ...DC MAGNETRON SPUTTERING (POSTPRINT) 5a. CONTRACT NUMBER In-house 5b. GRANT NUMBER 5c. PROGRAM ELEMENT NUMBER 62102F 6. AUTHOR(S) (see

  15. Dual Credit/Dual Enrollment and Data Driven Policy Implementation

    Science.gov (United States)

    Lichtenberger, Eric; Witt, M. Allison; Blankenberger, Bob; Franklin, Doug

    2014-01-01

    The use of dual credit has been expanding rapidly. Dual credit is a college course taken by a high school student for which both college and high school credit is given. Previous studies provided limited quantitative evidence that dual credit/dual enrollment is directly connected to positive student outcomes. In this study, predictive statistics…

  16. Dual coil ignition system

    Energy Technology Data Exchange (ETDEWEB)

    Huberts, Garlan J.; Qu, Qiuping; Czekala, Michael Damian

    2017-03-28

    A dual coil ignition system is provided. The dual coil ignition system includes a first inductive ignition coil including a first primary winding and a first secondary winding, and a second inductive ignition coil including a second primary winding and a second secondary winding, the second secondary winding connected in series to the first secondary winding. The dual coil ignition system further includes a diode network including a first diode and a second diode connected between the first secondary winding and the second secondary winding.

  17. Dual energy CT

    DEFF Research Database (Denmark)

    Al-Najami, Issam; Drue, Henrik Christian; Steele, Robert

    2017-01-01

    and inaccurate with existing methods. Dual Energy Computed Tomography (DECT) enables qualitative tissue differentiation by simultaneous scanning with different levels of energy. We aimed to assess the feasibility of DECT in quantifying tumor response to neoadjuvant therapy in loco-advanced rectal cancer. METHODS...... to determine the average quantitative parameters; effective-Z, water- and iodine-concentration, Dual Energy Index (DEI), and Dual Energy Ratio (DER). These parameters were compared to the regression in the resection specimen as measured by the pathologist. RESULTS: Changes in the quantitative parameters...

  18. The existence of a double S-shaped process curve during reactive magnetron sputtering

    Science.gov (United States)

    Schelfhout, R.; Strijckmans, K.; Depla, D.

    2016-09-01

    The four dimensional parameter space (discharge voltage and current and reactive gas flow and pressure) related to a reactive Ar/O2 DC magnetron discharge with an aluminum target and constant pumping speed was acquired by measuring current-voltage characteristics at different oxygen flows. The projection onto the pressure-flow plane allows us to study the well-known S-shaped process curve. This experimental procedure guarantees no time dependent effects on the result. The obtained process curve appears not to be unique but rather two significantly different S-shaped curves are noticed which depend on the history of the steady state target condition. As such, this result has not only an important impact on the fundamental description of the reactive sputtering process but it can also have its consequences on typical feedback control systems for the operation in the transition regime of the hysteresis during reactive magnetron sputtering.

  19. Performance Characterization of a Solenoid-type Gas Valve for the H- Magnetron Source at FNAL

    Energy Technology Data Exchange (ETDEWEB)

    Sosa, A. [Fermilab; Bollinger, D. S. [Fermilab; Karns, P. R. [Fermilab

    2016-09-06

    The magnetron-style H- ion sources currently in operation at Fermilab use piezoelectric gas valves to function. This kind of gas valve is sensitive to small changes in ambient temperature, which affect the stability and performance of the ion source. This motivates the need to find an alternative way of feeding H2 gas into the source. A solenoid-type gas valve has been characterized in a dedicated off-line test stand to assess the feasibility of its use in the operational ion sources. H- ion beams have been extracted at 35 keV using this valve. In this study, the performance of the solenoid gas valve has been characterized measuring the beam current output of the magnetron source with respect to the voltage and pulse width of the signal applied to the gas valve.

  20. Electrical properties of magnetron sputtered ZnO:Al samples determined by Hall and Seebeck measurements

    Energy Technology Data Exchange (ETDEWEB)

    Dewald, Wilma; Sittinger, Volker; Szyszka, Bernd [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Wimmer, Mark; Ruske, Florian [Helmholtz-Zentrum Berlin fuer Materialien und Energie (HZB), Berlin (Germany)

    2010-07-01

    Transparent conductive oxides (TCOs) play a big role in display and photovoltaic technology. One of the most promising materials for photovoltaic applications is aluminum doped zinc oxide. The electrical properties of differently prepared ZnO:Al films will be analyzed in this paper. Carrier mobility and free carrier density are varying in a wide range depending on the preparation method and doping level. Reactive mid frequency magnetron sputtering of a metallic Zn:Al target, radio frequency and direct current magnetron sputtering of a ceramic ZnO:Al{sub 2}O{sub 3} target are considered as well as the post deposition annealing of samples, which increases mobility significantly. The carrier mobility in polycrystalline aluminum doped ZnO is limited by scattering at grain boundaries and at ionized impurities. With Hall and Seebeck measurements insight will be given in transport and scatter mechanisms for the different samples.

  1. Properties of TiO2 Thin Films Prepared by Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films.

  2. Resistive switching behavior of RF magnetron sputtered ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Rajalakshmi, R.; Angappane, S., E-mail: angappane@cnsms.res.in [Centre for Nano and Soft Matter Sciences, Jalahalli, Bangalore-560013 (India)

    2015-06-24

    The resistive switching characteristics of RF magnetron sputtered zinc oxide thin films have been studied. The x-ray diffraction studies confirm the formation of crystalline ZnO on Pt/TiO{sub 2}/SiO{sub x}/Si substrate. We have fabricated Cu/ZnO/Pt device using a shadow masking technique for resistive switching study. Our Cu/ZnO/Pt device exhibits a unipolar resistive switching behaviour. The switching observed in our device could be related to oxygen vacancies or Cu ions that generate the conducting filaments responsible for resistive switching. We found HRS to LRS resistance ratio of as high as ∼200 for our Cu/ZnO/Pt device. The higher resistance ratio and stability of Cu/ZnO/Pt device would make our RF magnetron sputtered zinc oxide thin films suitable for non volatile memory applications.

  3. Resistive switching behavior of RF magnetron sputtered ZnO thin films

    Science.gov (United States)

    Rajalakshmi, R.; Angappane, S.

    2015-06-01

    The resistive switching characteristics of RF magnetron sputtered zinc oxide thin films have been studied. The x-ray diffraction studies confirm the formation of crystalline ZnO on Pt/TiO2/SiOx/Si substrate. We have fabricated Cu/ZnO/Pt device using a shadow masking technique for resistive switching study. Our Cu/ZnO/Pt device exhibits a unipolar resistive switching behaviour. The switching observed in our device could be related to oxygen vacancies or Cu ions that generate the conducting filaments responsible for resistive switching. We found HRS to LRS resistance ratio of as high as ˜200 for our Cu/ZnO/Pt device. The higher resistance ratio and stability of Cu/ZnO/Pt device would make our RF magnetron sputtered zinc oxide thin films suitable for non volatile memory applications.

  4. Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Y.Z. [South China Normal University, School of Physics and Telecommunication Engineering, Guangzhou (China); Xu, J. [Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, P.O. Box 800-211, Shanghai (China)

    2007-09-15

    The annealing effects of sapphire substrates on the quality of epitaxial ZnO films grown by dc reactive magnetron sputtering were studied. The atomic steps formed on (0001) sapphire ({alpha}-Al{sub 2}O{sub 3}) substrates surface by annealing at high temperature were analyzed by atomic force microscopy. Their influence on the growth of ZnO films was examined by X-ray diffraction and photoluminescence measurements. Experimental results indicate that the film quality is strongly affected by annealing treatment of the sapphire substrate surface. The optimum annealing temperature of sapphire substrates for ZnO grown by magnetron sputtering is 1400 C for 1 h in air. (orig.)

  5. Characterization thin films TiO2 obtained in the magnetron sputtering process

    Science.gov (United States)

    Kamiński, Maciej; Firek, Piotr; Caban, Piotr

    2016-12-01

    The aim of the study was to elucidate influence parameters of magnetron sputtering process on growth rate and quality of titanium dioxide thin films. TiO2 films were produced on two inch silicon wafers by means of magnetron sputtering method. Characterization of samples was performed using ellipsometer and atomic force microscope (AFM). Currentvoltage (I-V) and capacitance-voltage (C-V) measurements were also carried out. The results enable to determine impact of pressure, power, gases flow and process duration on the physical parameters obtained layers such as electrical permittivity, flat band voltage and surface topography. Experiments were designed according to orthogonal array Taguchi method. Respective trends impact were plotted.

  6. Preparation and characterization of Pd-Ag alloy composite membrane with magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    赵宏宾[1; 熊国兴[2; N.Stroh[3; H.Brunner[4

    1999-01-01

    A Pd-Ag (24 wt%) alloy composite membrane was prepared by the magnetron sputtering. A γ-Al2O3 membrane was synthesized by the sol-gel method and used as substrate of the Pd-Ag alloy film. The process parameters of the magnetron sputtering were optimized as a function of the compactness of the Pd-Ag alloy film. The best membrane with a thickness of 1 μm was produced with a sputtering pressure of 2.7 Pa and a substrate temperature of 400℃. The membrane had an H2/N2 permselectivity of 51.5--1000 and an H2 permeation rate of 0.036--1.17×10-5cm3/cm2·s· Pa, depending on operating conditions.

  7. Are the argon metastables important in high power impulse magnetron sputtering discharges?

    Energy Technology Data Exchange (ETDEWEB)

    Gudmundsson, J. T., E-mail: tumi@hi.is [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland); Lundin, D.; Minea, T. M. [Laboratoire de Physique des Gaz et Plasmas - LPGP, UMR 8578 CNRS, Université Paris-Sud, 91405 Orsay Cedex (France); Stancu, G. D. [CentraleSupélec, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); CNRS, UPR 288 Laboratoire EM2C, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); Brenning, N. [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping (Sweden)

    2015-11-15

    We use an ionization region model to explore the ionization processes in the high power impulse magnetron sputtering (HiPIMS) discharge in argon with a titanium target. In conventional dc magnetron sputtering (dcMS), stepwise ionization can be an important route for ionization of the argon gas. However, in the HiPIMS discharge stepwise ionization is found to be negligible during the breakdown phase of the HiPIMS pulse and becomes significant (but never dominating) only later in the pulse. For the sputtered species, Penning ionization can be a significant ionization mechanism in the dcMS discharges, while in the HiPIMS discharge Penning ionization is always negligible as compared to electron impact ionization. The main reasons for these differences are a higher plasma density in the HiPIMS discharge, and a higher electron temperature. Furthermore, we explore the ionization fraction and the ionized flux fraction of the sputtered vapor and compare with recent experimental work.

  8. Colored and transparent oxide thin films prepared by magnetron sputtering: the glass blower approach.

    Science.gov (United States)

    Gil-Rostra, Jorge; Chaboy, Jesús; Yubero, Francisco; Vilajoana, Antoni; González-Elipe, Agustín R

    2013-03-01

    This work describes the reactive magnetron sputtering processing at room temperature of several mixed oxide MxSiyOz thin films (M: Fe, Ni, Co, Mo, W, Cu) intended for optical, coloring, and aesthetic applications. Specific colors can be selected by adjusting the plasma gas composition and the Si-M ratio in the magnetron target. The microstructure and chemistry of the films are characterized by a large variety of techniques including X-ray photoemission spectroscopy, X-ray absorption spectroscopy (XAS), and infrared spectroscopy, while their optical properties are characterized by UV-vis transmission and reflection analysis. Particularly, XAS analysis of the M cations in the amorphous thin films has provided valuable information about their chemical state and local structure. It is concluded that the M cations are randomly distributed within the SiO2 matrix and that both the M concentration and its chemical state are the key parameters to control the final color of the films.

  9. Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Crăciunescu, Corneliu M., E-mail: corneliu.craciunescu@upt.ro; Mitelea, Ion, E-mail: corneliu.craciunescu@upt.ro; Budău, Victor, E-mail: corneliu.craciunescu@upt.ro [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara (Romania); Ercuţa, Aurel [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara and Department of Physics, West University Timisoara (Romania)

    2014-11-24

    Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

  10. A novel relativistic magnetron with circularly polarized TE11 coaxial waveguide mode

    Science.gov (United States)

    Shi, Di-Fu; Qian, Bao-Liang; Wang, Hong-Gang; Li, Wei; Du, Guang-Xing

    2016-11-01

    A novel relativistic magnetron (RM) with a circularly polarized TE11 coaxial waveguide mode and its corresponding mode excitation are investigated in this paper. By operating in the 4π/5 mode in the ten-cavity RM and compactly designing the RM structure with the all cavity-magnetron axial extraction technique, the RM can directly output a circularly polarized TE11 coaxial waveguide mode in a reversible direction of rotation without any mode converters. In addition, the analysis of mode excitation can be generalized to a 2N-cavity RM, where 2N  >  4 is the number of cavities. Results of the 3D particle-in-cell (PIC) simulation show that a high power microwave (HPM) with an operating frequency of 4.15 GHz and an output power of 700 MW is obtained from the RM, corresponding to the power conversion efficiency of 50.0%.

  11. Catalytic growth of ZnO nanostructures by r.f. magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Arroyo-Hernández María

    2011-01-01

    Full Text Available Abstract The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, with thicknesses close to the percolation threshold, are deposited by thermal evaporation in ultra high vacuum (UHV conditions and subsequently annealed to form gold nanodroplets. The ZnO structures are subsequently deposited by r.f. magnetron sputtering in a UHV chamber, and possible morphological differences between the ZnO grown on top of the substrate and on the gold are investigated. The results indicate a moderate catalytic effect for a deposited gold underlayer of 4 nm, quite close to the gold thin film percolation thickness.

  12. Power-combining based on master-slave injection-locking magnetron

    Science.gov (United States)

    Ping, Yuan; Yi, Zhang; Wenjun, Ye; Huacheng, Zhu; Kama, Huang; Yang, Yang

    2016-07-01

    A microwave power-combining system composed of two Panasonic 2M244-M1 magnetrons based on master-slave injection-locking is demonstrated in this paper. The principle of master-slave injection-locking and the locking condition are theoretical analyzed. Experimental results are consistent with the theoretical analysis and the experimental combined efficiency is higher than 96%. Compared with the external-injection-locked system, the power-combining based on the master-slave injection-locking magnetron is superior by taking out the external solid-state driver and the real-time phase control system. Thus, this power-combining system has great potential for obtaining a high efficiency, high stability, low cost, and high power microwave source. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

  13. Pseudo-3D PIC modeling of drift-induced spatial inhomogeneities in planar magnetron plasmas

    Science.gov (United States)

    Revel, A.; Minea, T.; Tsikata, S.

    2016-10-01

    A pseudo-3D modeling approach, based on a particle-in-cell (PIC)-Monte Carlo collisions algorithm, has been developed for the study of large- and short-scale organization of the plasma in a planar magnetron. This extension of conventional PIC modeling permits the observation of spontaneous organization of the magnetron plasma, under the influence of crossed electric and magnetic fields, into the well-known, large-scale regions of enhanced ionization and density known as spokes. The nature of complex three-dimensional electron trajectories around such structures, and non-uniform ionization within them, is revealed. This modeling provides direct numerical evidence for the existence of high-amplitude internal spoke electric fields, proposed in earlier works. A 3D phenomenological model, consistent with numerical results, is proposed. Electron density fluctuations in the megahertz range, with characteristics similar to the electron cyclotron drift instability experimentally identified in a recent Letter, are also found.

  14. Electrochemical Performance of rf Magnetron Sputtered LiCoO2 Thin Film Positive Electrodes

    Science.gov (United States)

    Kumar, P. Jeevan; Babu, K. Jayanth; Hussain, O. M.

    2010-12-01

    Thin films of LiCoO2 were grown by rf magnetron sputtering technique and studied the influence of In situ annealing treatment on microstructural and electrochemical properties of the films. Annealing treatment in presence of O2 ambient develops characteristic (104) plan in relative to (003) plane texture indicating that the films have HT-layered structure with R3¯m symmetry. The effect is discussed in terms of grain size, cycling stability, reversibility and the specific discharge capacity.

  15. Overview of Recent Studies and Design Changes for the FNAL Magnetron Ion Source

    Energy Technology Data Exchange (ETDEWEB)

    Bollinger, D. S. [Fermilab; Sosa, A. [Fermilab

    2016-09-06

    This paper will cover several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand described in [1], with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.

  16. TiO2 Thin Film UV Detectors Deposited by DC Reactive Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHANG Li-wei; YAO Ning; ZHANG Bing-lin; FAN Zhi-qin; YANG Shi-e; LU Zhan-ling

    2004-01-01

    Crystalline TiO2 thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposited on quartz substrate, the photoconductive UV detector on TiO2 thin films was based on a sandwich structure of C/ TiO2/ITO. The measurement of the I-V characteristics for these devices shows good ohmic contact. The photoresponse of TiO2 thin films was analyzed at different bias voltage. Voltage.

  17. Modelling and Optimization of Technological Process for Magnetron Synthesis of Altin Nanocomposite Films on Cutting Tools

    Science.gov (United States)

    Kozhina, T. D.

    2016-04-01

    The paper highlights the results of the research on developing the mechanism to model the technological process for magnetron synthesis of nanocomposite films on cutting tools, which provides their specified physical and mechanical characteristics by controlling pulsed plasma parameters. The paper presents optimal conditions for AlTiN coating deposition on cutting tools according to the ion energy of sputtered atoms in order to provide their specified physical and mechanical characteristics.

  18. Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Hu Ming

    2015-01-01

    Full Text Available The uniform nanocopper film was deposited on the surface of micron β-SiC particle by magnetron sputtering technology successfully. The surface morphology and phase constitution of the β-SiC particle with nanocopper film were analyzed and dynamic deposition behavior was investigated in detail. The concept of dynamic deposition was put forward to interpret formation mechanism of copper nanofilm on the surface of β-SiC particles.

  19. The Influence of Hydrogen on the Properties of Zinc Sulfide Thin Films Deposited by Magnetron Sputtering

    OpenAIRE

    2014-01-01

    Zinc sulfide thin films have been deposited with hydrogen in Ar and Ar+H2 atmosphere by radio frequency magnetron sputtering. The thickness, structural properties, composition, surface morphology, and optical and electrical properties of the films have been investigated. Effect of hydrogen on the properties of the film was studied. The results showed that hydrogen leads to better crystallinity and larger crystallite size of ZnS polycrystalline films. The band gaps of the films in Ar+H2 are ab...

  20. Optical and morphological properties of porous diamond-like-carbon films deposited by magnetron sputtering

    OpenAIRE

    Baroni, M. P. M. A.; Conceição, M. Ventura; Rosa, R. R.; Persson, C.; Arwin, H.; Silva Jr., E.F. da; Roman, L.S.; Nakamura, O.; I. Pepe; Silva, A. Ferreira da

    2006-01-01

    RESTRITO Porous diamond-like-carbon (PDLC) thin films obtained on silicon substrate by DC low energy magnetron sputtering have been investigated by photoluminescence, transmission and reflection spectroscopy, photoacoustic and spectroscopic ellipsometry. The absorption features observed for these films show similarities with those of porous silicon (PS) as well as in the performed gradient structural pattern classification of the SFM porosity, by means of the computational GPA-flyby enviro...

  1. Plasma potential of a moving ionization zone in DC magnetron sputtering

    Science.gov (United States)

    Panjan, Matjaž; Anders, André

    2017-02-01

    Using movable emissive and floating probes, we determined the plasma and floating potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge. Measurements were recorded in a space and time resolved manner, which allowed us to make a three-dimensional representation of the plasma potential. From this information we could derive the related electric field, space charge, and the related spatial distribution of electron heating. The data reveal the existence of strong electric fields parallel and perpendicular to the target surface. The largest E-fields result from a double layer structure at the leading edge of the ionization zone. We suggest that the double layer plays a crucial role in the energization of electrons since electrons can gain several 10 eV of energy when crossing the double layer. We find sustained coupling between the potential structure, electron heating, and excitation and ionization processes as electrons drift over the magnetron target. The brightest region of an ionization zone is present right after the potential jump, where drifting electrons arrive and where most local electron heating occurs. The ionization zone intensity decays as electrons continue to drift in the Ez × B direction, losing energy by inelastic collisions; electrons become energized again as they cross the potential jump. This results in the elongated, arrowhead-like shape of the ionization zone. The ionization zone moves in the -Ez × B direction from which the to-be-heated electrons arrive and into which the heating region expands; the zone motion is dictated by the force of the local electric field on the ions at the leading edge of the ionization zone. We hypothesize that electron heating caused by the potential jump and physical processes associated with the double layer also apply to magnetrons at higher discharge power, including high power impulse magnetron sputtering.

  2. 磁控管微波振荡%MAGNETRON MICROWAVE RESONANT

    Institute of Scientific and Technical Information of China (English)

    徐劳立; 刘宇星; 王越

    2015-01-01

    The magnetron is an efficient self‐oscillation device for transferring the alternating current electrical energy to microwave electromagnetic energy and being used extensively for radar ,navigation ,microwave ovens ,and etc .The construction of magnetron is simple while its working principle is complex ,which is involved with electric engineering ,high frequency electromagnetic field and complex motion of electrons bunches .The content herein sketches briefly the component construction of magnetron ,analysis method of operation mechanism , resonance frequency and the energy conversion during electrons motion .The starting of micro‐wave oscillation controlled by orthogonal static electromagnetic field is discussed and an analo‐gy is made between the resonance excitation of magnetron and a bow drawing across the strings of a violin .%磁控管是一种结构简单而效率较高的自振荡器件,可将输入的交流电电能转换为输出的微波电磁能,广泛应用于雷达、导航和微波加热。这一重要应用技术的工作原理较复杂,涉及电工技术、高频电磁场理论和复杂的电子运动,本文简述了磁控管的组成结构、分析方法、谐振频率和能量转换的过程,介绍了磁控管内电子的运动形态和典型速度,以及磁控管中的正交静态电磁场对磁控管建立微波振荡的作用,并在固有振荡的激励方面将磁控管与弓弦乐器做了类比。

  3. Experimental investigation of quasiperiodic-chaotic-quasiperiodic-chaotic transition in a direct current magnetron sputtering plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sabavath, Gopi Kishan; Banerjee, I.; Mahapatra, S. K., E-mail: skmahapatra@bitmesra.ac.in [Plasma Laboratory, Department of Physics, Birla Institute of Technology-Mesra, Ranchi 835215 (India); Shaw, Pankaj Kumar; Sekar Iyengar, A. N. [Plasma Physics Division, Saha Institute of Nuclear Physics, 1/AF, Bidhannagar, Kolkata 700064 (India)

    2015-08-15

    Floating potential fluctuations from a direct current magnetron sputtering plasma have been analysed using time series analysis techniques like phase space plots, power spectra, frequency bifurcation plot, etc. The system exhibits quasiperiodic-chaotic-quasiperiodic-chaotic transitions as the discharge voltage was increased. The transitions of the fluctuations, quantified using the largest Lyapunov exponent, have been corroborated by Hurst exponent and the Shannon entropy. The Shannon entropy is high for quasiperiodic and low for chaotic oscillations.

  4. Photocatalytic Activity of Reactively Sputtered Titania Coatings Deposited Using a Full Face Erosion Magnetron

    OpenAIRE

    Farahani, Nick; Kelly, Peter,; West, Glen; Hill, Claire; Vishnyakov, Vladimir

    2013-01-01

    Titanium dioxide (titania) is widely used as a photocatalyst for its moderate band gap, high photoactivity, recyclability, nontoxicity, low cost and its significant chemical stability. The anatase phase of titania is known to show the highest photocatalytic activity, however, the presence of this phase alone is not sufficient for sustained activity. In this study TiO2 coatings were deposited onto glass substrates by mid-frequency pulsed magnetron sputtering from metallic targets in reactive m...

  5. Fabrication and characterization of flaky core-shell particles by magnetron sputtering silver onto diatomite

    Science.gov (United States)

    Wang, Yuanyuan; Zhang, Deyuan; Cai, Jun

    2016-02-01

    Diatomite has delicate porous structures and various shapes, making them ideal templates for microscopic core-shell particles fabrication. In this study, a new process of magnetron sputtering assisted with photoresist positioning was proposed to fabricate lightweight silver coated porous diatomite with superior coating quality and performance. The diatomite has been treated with different sputtering time to investigate the silver film growing process on the surface. The morphologies, constituents, phase structures and surface roughness of the silver coated diatomite were analyzed with SEM, EDS, XRD and AFM respectively. The results showed that the optimized magnetron sputtering time was 8-16 min, under which the diatomite templates were successfully coated with uniform silver film, which exhibits face centered cubic (fcc) structure, and the initial porous structures were kept. Moreover, this silver coating has lower surface roughness (RMS 4.513 ± 0.2 nm) than that obtained by electroless plating (RMS 15.692 ± 0.5 nm). And the infrared emissivity of coatings made with magnetron sputtering and electroless plating silver coated diatomite can reach to the lowest value of 0.528 and 0.716 respectively.

  6. Fabrication of Optical Multilayer Devices from Porous Silicon Coatings with Closed Porosity by Magnetron Sputtering.

    Science.gov (United States)

    Caballero-Hernández, Jaime; Godinho, Vanda; Lacroix, Bertrand; Jiménez de Haro, Maria C; Jamon, Damien; Fernández, Asunción

    2015-07-01

    The fabrication of single-material photonic-multilayer devices is explored using a new methodology to produce porous silicon layers by magnetron sputtering. Our bottom-up methodology produces highly stable amorphous porous silicon films with a controlled refractive index using magnetron sputtering and incorporating a large amount of deposition gas inside the closed pores. The influence of the substrate bias on the formation of the closed porosity was explored here for the first time when He was used as the deposition gas. We successfully simulated, designed, and characterized Bragg reflectors and an optical microcavity that integrates these porous layers. The sharp interfaces between the dense and porous layers combined with the adequate control of the refractive index and thickness allowed for excellent agreement between the simulation and the experiments. The versatility of the magnetron sputtering technique allowed for the preparation of these structures for a wide range of substrates such as polymers while also taking advantage of the oblique angle deposition to prepare Bragg reflectors with a controlled lateral gradient in the stop band wavelengths.

  7. Estimation of Sputtering Damages on a Magnetron H- Ion Source Induced by Cs+ and H+ Ions

    CERN Document Server

    Pereira, H; Alessi, J; Kalvas, t

    2013-01-01

    An H− ion source is being developed for CERN’s Linac4 accelerator. A beam current requirement of 80 mA and a reliability above 99% during 1 year with 3 month uninterrupted operation periods are mandatory. To design a low-maintenance long life-time source, it is important to investigate and understand the wear mechanisms. A cesiated plasma discharge ion source, such as the BNL magnetron source, is a good candidate for the Linac4 ion source. However, in the magnetron source operated at BNL, the removal of material from the molybdenum cathode and the stainless steel anode cover plate surfaces is visible after extended operation periods. The observed sputtering traces are shown to result from cesium vapors and hydrogen gas ionized in the extraction region and subsequently accelerated by the extraction field. This paper presents a quantitative estimate of the ionization of cesium and hydrogen by the electron and H− beams in the extraction region of BNL’s magnetron ion source. The respective contributions o...

  8. Theoretical investigation of frequency characteristics of free oscillation and injection-locked magnetrons

    Science.gov (United States)

    Yue, Song; Gao, Dong-ping; Zhang, Zhao-chuan; Wang, Wei-long

    2016-11-01

    The frequency characteristics of free oscillation magnetron (FOM) and injection-locked magnetron (ILM) are theoretically investigated. By using the equal power voltage obtained from the experiment data, expressions of the frequency and radio frequency (RF) voltage of FOM and ILM, as well as the locking bandwidth, on the anode voltage and magnetic field are derived. With the increase of the anode voltage and the decrease of the magnetic field, the power and its growth rate increase, while the frequency increases and its growth rate decreases. The theoretical frequency and power of FOM agree with the particle-in-cell (PIC) simulation results. Besides, the theoretical trends of the power and frequency with the anode voltage and magnetic field are consistent with the experimental results, which verifies the accuracy of the theory. The theory provides a novel calculation method of frequency characteristics. It can approximately analyze the power and frequency of both FOM and ILM, which promotes the industrial applications of magnetron and microwave energy. Project supported by the National Basic Research Program of China (Grant No. 2013CB328901) and the National Natural Science Foundation of China (Grant No. 11305177).

  9. Investigation of bunch repetition rate deviations in FIR FEL driven by a magnetron-based microtron

    CERN Document Server

    Kazakevitch, Grigori M; Lee Byung Cheol; Lee, J

    2002-01-01

    The stability of the bunch repetition rate in a FIR FEL driven by a 2.8 GHz magnetron-based microtron was investigated using a heterodyne method with a low Q-factor straight-flight measuring cavity. The measuring cavity is located in the straight section of the FIR FEL injection beam line and is excited by the passage of electron bunches. The RF signal from the measuring cavity coupling loop was mixed with a precise heterodyne signal with a frequency difference of several MHz. The beat frequency was analyzed to obtain the temporal distribution of the bunch repetition rate deviation during the macro pulse of the electron beam. The time resolution and the accuracy of measurements are approximately 100 ns and a few kHz, respectively. Based on this data, we could determine the level and shape of the magnetron current and the initial frequency shift between magnetron and accelerating cavity for the FEL operation in the wavelength range 100-300 microns.

  10. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Bogota Colombia (Colombia); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico)], E-mail: muhl@servidor.unam.mx

    2008-10-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN{sub x} films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N{sub 2} ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV{sub 0.025}. While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV{sub 0.025}. The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics.

  11. Walkable dual emissions

    National Research Council Canada - National Science Library

    Xu, Hai-Bing; Jiao, Peng-Chong; Kang, Bin; Deng, Jian-Guo; Zhang, Yan

    2013-01-01

    Walkable dual emissions, in which the emission bands of the walker reversibly cross or leave those of the stationary ones depending on temperature and concentration, have been demonstrated in cyclic...

  12. Effects of Power Density and Post Annealing Process on the Microstructure and Wettability of TiO2 Films Deposited by Mid-frequency Magnetron Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Ying CUI; Hao DU; Jinquan XIAO; Lishi WEN

    2008-01-01

    The relationship of "preparation parameters-microstructures-wettability" of TiO2 films was reported. In this work, TiO2 films were deposited onto glass and silicon substrates by using mid-frequency dual magnetron sputtering technique at ambient temperature with various power densities and deposition time. After de- position, the films were heat treated at different annealing temperatures. X-ray diffraction (XRD), Raman spectroscopy, and field-emission scanning electron microscopy (FE-SEM) were utilized to characterize TiO2 films. The wettability of the films was evaluated by water contact angle measurement. The phase transition temperature of TiO2 films depended on the power density. It was demonstrated that wettability was strongly structure dependent and the film with the thickness of 610 nm (the power density was 2.22 W/cm2) showed the lowest contact angle (8°). It can be concluded that smaller crystallite size, the rutile phase with (110) face being parallel to the surface, and tensile stress favored the hydrophilicity of the TiO2 films.

  13. Deposition and characterization of TaAIN thin films by reactive magnetron sputtering; Deposicao e caracterizacao de filmes finos de TaAIN depositados por magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, G.B.; Fernandez, D.R.; Fontes Junior, A.S.; Felix, L.C.; Tentardini, E.K. [Universidade Federal de Sergipe (UFS), Sao Cristovao, SE (Brazil). Departamento de Ciencia e Engenharia de Materiais; Hubler, R. [Pontificia Universidade Catolica do Rio Grande do Sul (PUC-RS), RS (Brazil); Silva Junior, A.H. da, E-mail: brito-g@hotmail.com [Universidade Federal do Rio Grande do Sul (UFRGS), RS (Brazil)

    2016-07-01

    Phase stability, oxidation resistance and great mechanical properties are the main objectives when synthesizing protective coatings. The tantalum nitride (TaN) has aroused interest because of its high temperature stability, chemical inertness and thermal conductivity. However, it has a low hardness value when compared to other coatings. Researches has shown that one way to improvements in the properties of a thin film is by adding other elements in the deposition process. Therefore, the objective of this study was to deposit thin films of TaAlN by magnetron sputtering, changing the aluminum concentration of 2, 5, 7, to 14%. Then the coatings were characterized by EDS, RBS, GIXRD and nanohardness. In this study was found that the aluminum deposited did not change the oxidation resistance of the coating, and the highest value of hardness was 28 GPa for the sample with 14 at.%. (author)

  14. Development of a Magnetron Resonance Frequency Auto Tuning System for Medical Xband [9300 MHz] RF Linear Accelerator

    Energy Technology Data Exchange (ETDEWEB)

    Cha, Sung Su; Lee, Byung Cheol [University of Science and Technology, Daejeon (Korea, Republic of); Kim, Yujong; Park, Hyung Dal; Lee, Byeong-No; Joo, Youngwoo; Cha, Hyungki; Lee, Soo Min; Song, Ki Baek [KAERI, Daejeon (Korea, Republic of); Lee, Seung Hyun [Sungkyunkwan University, Suwon (Korea, Republic of)

    2015-05-15

    The total components of the accelerator are the magnetron, electron gun, accelerating structure, a set of solenoid magnets, four sets of steering coils, a modulator, and a circulator. One of the accelerator components of the accelerating structure is made of oxygen-free high-conductivity copper (OFHC), and its volume is changed according to the ambient temperature. As the volume changes, the resonant frequency of the accelerating structure is changed. Accordingly, the resonance frequency is mismatched between the source of the magnetron and the accelerating structure. An automatic frequency tuning system is automatically matched with the resonant frequency of the magnetron and accelerating structure, which allows a high output power and reliable accelerator operation. An automatic frequency tuning system is composed of a step motor control part for correcting the frequency of the source and power measuring parts, i.e., the forward and reflected power between the magnetron and accelerating structure. In this paper, the design, fabrication, and RF power test of the automatic frequency tuning system for the X-band linac are presented. A frequency tuning system was developed to overcome an unstable accelerator operation owing to the frequency mismatch between the magnetron and accelerating structure. The frequency measurement accuracy is 100 kHz and 0.72 degree per pulse.

  15. Reactive sputtering of δ-ZrH{sub 2} thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Högberg, Hans, E-mail: hans.hogberg@liu.se; Tengdelius, Lina; Eriksson, Fredrik; Broitman, Esteban; Lu, Jun; Jensen, Jens; Hultman, Lars [Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Samuelsson, Mattias [Impact Coatings AB, Westmansgatan 29, SE-582 16 Linköping (Sweden)

    2014-07-01

    Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H{sub 2} plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis. X-ray photoelectron spectroscopy reveals a chemical shift of ∼0.7 eV to higher binding energies for the Zr-H films compared to pure Zr films, consistent with a charge transfer from Zr to H in a zirconium hydride. X-ray diffraction shows that the films are single-phase δ-ZrH{sub 2} (CaF{sub 2} type structure) at H content >∼55 at. % and pole figure measurements give a 111 preferred orientation for these films. Scanning electron microscopy cross-section images show a glasslike microstructure for the HiPIMS films, while the DCMS films are columnar. Nanoindentation yield hardness values of 5.5–7 GPa for the δ-ZrH{sub 2} films that is slightly harder than the ∼5 GPa determined for Zr films and with coefficients of friction in the range of 0.12–0.18 to compare with the range of 0.4–0.6 obtained for Zr films. Wear resistance testing show that phase-pure δ-ZrH{sub 2} films deposited by HiPIMS exhibit up to 50 times lower wear rate compared to those containing a secondary Zr phase. Four-point probe measurements give resistivity values in the range of ∼100–120 μΩ cm for the δ-ZrH{sub 2} films, which is slightly higher compared to Zr films with values in the range 70–80 μΩ cm.

  16. Investigation of the Working Parameters of a Single Magnetron of a Multiple Ion Cluster Source: Determination of the Relative Influence of the Parameters on the Size and Density of Nanoparticles

    Directory of Open Access Journals (Sweden)

    Manuel Ruano

    2013-01-01

    Full Text Available Multiple Ion Cluster Source (MICS is the new optimized route of a standard technique based on a sputtering gas aggregation source, the Ion Cluster Source. The single magnetron used in the standard Ion Cluster Source is replaced by three magnetrons inside the aggregation zone, and they are controlled individually in order to fabricate nanoparticles with the desired and tunable chemical composition. Apart from the working parameters of each magnetron, it is also reported that the relation between the working parameters of individual magnetrons is of prime importance for the control of both the size and density of the nanoparticles. The influences of fluxes of the sputtering gas applied to each magnetron, the total gas flux in the aggregation zone, the position in the aggregation zone of Ag magnetron, and the relative position of the magnetrons in the aggregation zone have been studied through the operation of one of the magnetrons loaded with a silver target.

  17. Dual phase evolution

    CERN Document Server

    Green, David G; Abbass, Hussein A

    2014-01-01

    This book explains how dual phase evolution operates in all these settings and provides a detailed treatment of the subject. The authors discuss the theoretical foundations for the theory, how it relates to other phase transition phenomena and its advantages in evolutionary computation and complex adaptive systems. The book provides methods and techniques to use this concept for problem solving. Dual phase evolution concerns systems that evolve via repeated phase shifts in the connectivity of their elements. It occurs in vast range of settings, including natural systems (species evolution, landscape ecology, geomorphology), socio-economic systems (social networks) and in artificial systems (annealing, evolutionary computing).

  18. Commuting Dual Toeplitz Operators on the Polydisk

    Institute of Scientific and Technical Information of China (English)

    Yu Feng LU; Shu Xia SHANG

    2007-01-01

    On the polydisk, the commutativity of dual Toeplitz operators is studied. We obtain characterizations of commuting dual Toeplitz operators, essentially commuting dual Toeplitz operators and essentially semi-commuting dual Toeplitz operators.

  19. Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyun-Ju [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Jeong, Yong-Hoon [Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Prosthodontics and Restorative Science, College of Dentistry, The Ohio State University, Columbus, OH (United States)

    2014-12-01

    The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO{sub 3}){sub 2} + 3 mM NH{sub 4}H{sub 2}PO{sub 4}. Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings.

  20. Tailoring of antibacterial Ag nanostructures on TiO2 nanotube layers by magnetron sputtering.

    Science.gov (United States)

    Uhm, Soo-Hyuk; Song, Doo-Hoon; Kwon, Jae-Sung; Lee, Sang-Bae; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-04-01

    To reduce the incidence of postsurgical bacterial infection that may cause implantation failure at the implant-bone interface, surface treatment of titanium implants with antibiotic materials such as silver (Ag) has been proposed. The purpose of this work was to create TiO2 nanotubes using plasma electrolytic oxidation (PEO), followed by formation of an antibacterial Ag nanostructure coating on the TiO2 nanotube layer using a magnetron sputtering system. PEO was performed on commercially pure Ti sheets. The Ag nanostructure was added onto the resulting TiO2 nanotube using magnetron sputtering at varying deposition rates. Field emission scanning electron microscopy and transmission electron microscopy were used to characterize the surface, and Ag content on the TiO2 nanotube layer was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. Scanning probe microscopy for surface roughness and contact angle measurement were used to indirectly confirm enhanced TiO2 nanotube hydrophilicity. Antibacterial activity of Ag ions in solution was determined by inductively coupled plasma mass spectrometry and antibacterial testing against Staphylococcus aureus (S. aureus). In vitro, TiO2 nanotubes coated with sputtered Ag resulted in significantly reduced S. aureus. Cell viability assays showed no toxicity for the lowest sputtering time group in the osteoblastic cell line MC3T3-E1. These results suggest that a multinanostructured layer with a biocompatible TiO2 nanotube and antimicrobial Ag coating is a promising biomaterial that can be tailored with magnetron sputtering for optimal performance.

  1. Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dhandapani, Vishnu Shankar [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Subbiah, Ramesh [Center for Biomaterials, Korea Institute of Science and Technology (KIST), Seoul 136-791 (Korea, Republic of); Department of Biomedical Engineering, Korea University of Science and Technology (UST), Daejon 305-333 (Korea, Republic of); Thangavel, Elangovan [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Arumugam, Madhankumar [Center of Research Excellence in Corrosion, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Park, Kwideok [Center for Biomaterials, Korea Institute of Science and Technology (KIST), Seoul 136-791 (Korea, Republic of); Department of Biomedical Engineering, Korea University of Science and Technology (UST), Daejon 305-333 (Korea, Republic of); Gasem, Zuhair M. [Center of Research Excellence in Corrosion, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Veeraragavan, Veeravazhuthi, E-mail: vv.vazhuthi@gmail.com [PG & Research Department of Physics, PSG College of Arts & Science, Coimbatore 641 014, Tamil Nadu (India); Kim, Dae-Eun, E-mail: kimde@yonsei.ac.kr [Center for Nano-Wear, Yonsei University, Seoul 120-749 (Korea, Republic of); Department of Mechanical Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of)

    2016-05-15

    Highlights: • a-C:Ti nanocomposite coatings were prepared on 316L stainless steel by using R.F. magnetron sputtering method. • Properties of the nanocomposite coatings were analyzed with respect to titanium content. • Corrosion resistance, biocompatibility and hydrophobicity of nanocomposite coating were enhanced with increasing titanium content. • Coating with 2.33 at.% titanium showed superior tribological properties compared to other coatings. - Abstract: Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp{sup 2} bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

  2. Characteristic Features of the Formation of a Combined Magnetron-Laser Plasma in the Processes of Deposition of Film Coatings

    Science.gov (United States)

    Burmakov, A. P.; Kuleshov, V. N.; Prokopchik, K. Yu.

    2016-09-01

    A block diagram of a facility for combined magnetron-laser deposition of coatings and of the systems of controlling and managing this process is considered. The results of analysis of the influence of the gas medium and of laser radiation parameters on the emission-optical properties of laser plasma are considered. The influence of the laser plasma on the electric characteristics of a magnetron discharge is analyzed. The formation of the laser plasma-initiated pulse arc discharge has been established and the influence of the laser radiation parameters on the electric characteristics of this discharge has been determined. The emission optical spectra of the magnetron discharge plasma and of erosion laser plasma are compared separately and in combination.

  3. Transparent conducting zinc oxide thin film prepared by off-axis rf magnetron sputtering

    Indian Academy of Sciences (India)

    M K Jayaraj; Aldrin Antony; Manoj Ramachandran

    2002-06-01

    Highly conducting and transparent ZnO : Al thin films were grown by off-axis rf magnetron sputtering on amorphous silica substrates without any post-deposition annealing. The electrical and optical properties of the films deposited at various substrate temperatures and target to substrate distances were investigated in detail. Optimized ZnO : Al films have conductivity of 2200 S cm–1 and average transmission in the visible range is higher than 85%. The conductivity and mobility show very little temperature dependence.

  4. Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering

    OpenAIRE

    Bodeux, Romain; Michau, Dominique; Josse, Michaël; Maglione, Mario

    2014-01-01

    International audience; Tetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO2/SiO2/Si substrates from Ba2LnFeNb4O15 ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk,...

  5. Use of Multiple DC Magnetron Deposition Sources for Uniform Coating of Large Areas (Preprint)

    Science.gov (United States)

    2009-06-01

    2005- 1 June 2009 4. TITLE AND SUBTITLE 5a. CONTRACT NUMBER FA9451-04-C-0067 DF297548 Use of multiple DC magnetron deposition sources for...thickness at some point on the substrate plane to yield a relative thickness distribution or it can be used to find the ratio Mlm which will be useful... Mlm of the material deposited in each area, is shown in columns 3 though 5, for the three sources.. For example, within the area from the center of the

  6. Surface passivation of gallium nitride by ultrathin RF-magnetron sputtered Al2O3 gate.

    Science.gov (United States)

    Quah, Hock Jin; Cheong, Kuan Yew

    2013-08-14

    An ultrathin RF-magnetron sputtered Al2O3 gate on GaN subjected to postdeposition annealing at 800 °C in O2 ambient was systematically investigated. A cross-sectional energy-filtered transmission electron microscopy revealed formation of crystalline Al2O3 gate, which was supported by X-ray diffraction analysis. Various current conduction mechanisms contributing to leakage current of the investigated sample were discussed and correlated with metal-oxide-semiconductor characteristics of this sample.

  7. Magnetron sputtered gadolinia-doped ceria diffusion barriers for metal-supported solid oxide fuel cells

    DEFF Research Database (Denmark)

    Sønderby, Steffen; Klemensø, Trine; Christensen, Bjarke H.

    2014-01-01

    Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3...... and substrate bias voltage. A GDC layer thickness of 0.6 μm is found to effectively block Sr diffusion when bias voltage and deposition temperature is tuned to promote dense coatings. The adatom mobility has a large influence on the film density. Low temperature and bias voltage result in underdense column...

  8. R.F. magnetron sputtering of multilayered c-BN films on cemented carbide tool.

    Science.gov (United States)

    Park, Sungtae; Jeong, Sehoon; Lee, Kwangmin

    2011-02-01

    A c-BN thin film was deposited using a B4C target in a r.f. magnetron sputtering system. The c-BN layer was coated with a TiAIN adhesion layer (approximately 2 microm), boron carbide (approximately 1 microm) and BCN (10 approximately 15 nm) nano-gradient layer system. The c-BN layers with thicknesses of more than 0.5 microm were successfully deposited onto cemented carbide substrates. The high resolution XPS spectra analysis of B1s and N1s revealed that the c-BN film was mainly composed of sp3 BN bonds.

  9. Ground state atomic oxygen in high-power impulse magnetron sputtering: a quantitative study

    Science.gov (United States)

    Britun, Nikolay; Belosludtsev, Alexandr; Silva, Tiago; Snyders, Rony

    2017-02-01

    The ground state density of oxygen atoms in reactive high-power impulse magnetron sputtering discharges has been studied quantitatively. Both time-resolved and space-resolved measurements were conducted. The measurements were performed using two-photon absorption laser-induced fluorescence (TALIF), and calibrated by optical emission actinometry with multiple Ar emission lines. The results clarify the dynamics of the O ground state atoms in the discharge afterglow significantly, including their propagation and fast decay after the plasma pulse, as well as the influence of gas pressure, O2 admixture, etc.

  10. RP and RQA Analysis for Floating Potential Fluctuations in a DC Magnetron Sputtering Plasma

    Science.gov (United States)

    Sabavath, Gopikishan; Banerjee, I.; Mahapatra, S. K.

    2016-04-01

    The nonlinear dynamics of a direct current magnetron sputtering plasma is visualized using recurrence plot (RP) technique. RP comprises the recurrence quantification analysis (RQA) which is an efficient method to observe critical regime transitions in dynamics. Further, RQA provides insight information about the system’s behavior. We observed the floating potential fluctuations of the plasma as a function of discharge voltage by using Langmuir probe. The system exhibits quasi-periodic-chaotic-quasi-periodic-chaotic transitions. These transitions are quantified from determinism, Lmax, and entropy of RQA. Statistical investigations like kurtosis and skewness also studied for these transitions which are in well agreement with RQA results.

  11. Determination of the deposition rate of DC magnetron sputtering in fabrication of X-ray supermirrors

    Institute of Scientific and Technical Information of China (English)

    Fengli Wang; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Wenjuan Wu; Shumin Zhang; Lingyan Chen

    2006-01-01

    @@ X-ray supermirror is a non-periodic multilayer structure,whose optical performance is greatly affected by the stability and accuracy of the deposition rate in the fabrication using the direct current (DC) magnetron sputtering.By considering the location-setting time of the substrate positioning above the sputtering target,the deposition rate can be accurately determined.Experimental results show that the optical performance of the supermirror is in agreement with the design aim,which indicates that the layer thickness is well controlled and coincides with the desired ones.

  12. Optical properties and residual stress in Nb-Si composite films prepared by magnetron cosputtering.

    Science.gov (United States)

    Tang, Chien-Jen; Porter, Glen Andrew; Jaing, Cheng-Chung; Tsai, Fang-Ming

    2015-02-01

    This paper investigates Nb-Si metal composite films with various proportions of niobium in comparison to pure Nb films. Films were prepared by two-target RF-DC magnetron cosputtering deposition. The optical properties and residual stress were analyzed. A composition of Nb(0.74)Si(0.26) was chosen toward the design and fabrication of solar absorbing coatings having a high absorption in a broad wavelength range, a low residual stress, and suitable optical constants. The layer thicknesses and absorption characteristics of the Nb-Si composite films adhere more closely to the design than other coatings made of dielectric film materials.

  13. Venting temperature determines surface chemistry of magnetron sputtered TiN films

    Science.gov (United States)

    Greczynski, G.; Mráz, S.; Hultman, L.; Schneider, J. M.

    2016-01-01

    Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature Tv, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that Tv has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

  14. Temperature-driven spin reorientation transition of magnetron sputtered nickel thin film

    Institute of Scientific and Technical Information of China (English)

    Song Xiao-Hui; Zhang Dian-Lin

    2008-01-01

    The temperature-driven spin reorientation transition of magnetron sputtered Ni/Si(111)systems has been studied.The relationship between ac initial susceptibility and temperature of nickel films with different thicknesses shows that the magnetization orientation changes from in-plane to out-of-plane with the increase of temperature.The temperature dependence of magnetoelastic,magneto-crystalline,and magnetostatic anisotropies determines the direction of the reorientation transition.The temperature-driven spin reorientation transition is supported by Hall coefficient measurements which show that its temperature dependence is similar to that of susceptibility.

  15. Microstructure of titanium nitride thin films controlled by ion bombardment in a magnetron-sputtering device

    Energy Technology Data Exchange (ETDEWEB)

    Cerny, R. (Karlova Univ., Prague (Czech Republic). Fakulta Matematicko-Fyzikalni); Kuzel, R. Jr. (Karlova Univ., Prague (Czech Republic). Fakulta Matematicko-Fyzikalni); Valvoda, V. (Karlova Univ., Prague (Czech Republic). Fakulta Matematicko-Fyzikalni); Kadlec, S. (Czechoslovak Academy of Sciences, Prague (Czechoslovakia). Inst. of Physics); Musil, J. (Czechoslovak Academy of Sciences, Prague (Czechoslovakia). Inst. of Physics)

    1994-05-01

    The structure of titanium nitride thin films deposited by unbalanced magnetron sputtering on high chromium steel substrates was studied by X-ray diffraction. In order to characterize relations between the microstructure of sputtered TiN films and the deposition conditions, the parameter E[sub p] was introduced as the average energy transmitted from bombarding particles (ions, electrons, neutrals, photons) to one condensing particle of the film. A transition from a porous to a compact microstructure was found with increasing E[sub p]. The possible inhomogeneity of titanium nitride films is discussed. (orig.)

  16. Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    高明伟; 叶超; 王响英; 何一松; 郭佳敏; 杨培芳

    2016-01-01

    Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency (VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp3 contents. These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp3 contents.

  17. Surface functionalization of nanostructured LaB6-coated Poly Trilobal fabric by magnetron sputtering

    Science.gov (United States)

    Wu, Yan; Zhang, Lin; Min, Guanghui; Yu, Huashun; Gao, Binghuan; Liu, Huihui; Xing, Shilong; Pang, Tao

    2016-10-01

    Nanostructured LaB6 films were deposited on flexible Poly Trilobal substrates (PET textiles) through direct current magnetron sputtering in order to broaden its applications and realize surface functionalization of polyester fabrics. Characterizations and performances were investigated by employing a scanning electron microscope (SEM), Fourier transformation infrared spectroscopy (FT-IR) and ultraviolet-visible (UV-vis) spectrophotometer. Ultraviolet Protection Factor (UPF) conducted by the integral conversion was employed to measure the ultraviolet protection ability. As expected, the growth of LaB6 film depending on the pressure variation enhanced UV-blocking ability (UPF rating at 30.17) and absorption intensity of the textiles.

  18. Development of Nb3Sn coatings by magnetron sputtering for SRF cavities

    CERN Document Server

    Rosaz, G.; Leaux, F.; Motschmann, F.; Mydlarz, Z.; Taborelli, M.; Vollenberg, W.

    2016-01-01

    This paper presents the first results obtained on DC magnetron sputtering of Nb3Sn thin films dedicated to superconducting radio frequency cavities (SRF). Nb/Sn ratio of 3.76 and 3.2 have been obtained for Ar coating pressures of respectively 1.10-3 mbar and 5.10-2 mbar. According to XRD analyses both coating pressures lead to amorphous Nb3Sn layers that are not superconducting. Afterward, one coating has been annealed at 700°C, 750°C and 800°C under vacuum for 24h and exhibited for the three different temperatures the A15 cubic phase.

  19. SnOx Thin Films Deposited by Reactive Magnetron Sputtering for Microbatteries Anodes

    Institute of Scientific and Technical Information of China (English)

    XING Guang-jian; YANG Zhi-min; SHEN Wan; MAO Chang-hui; DU Jun

    2004-01-01

    SnOx thin films, with various oxygen deficiencies, are deposited from a Sn target on to silicon substratesby reactive magnetron sputtering. The SnOx films are characterized by X-ray diffraction ( XRD ) and X-ray photoelectron spectroscopy(XPS). Influences of deposition conditions such as oxygen partial pressure and annealing temperature on the characteristicsof the films are discussed in detail. The high reversible capacity and cycle performance characteristics of SnOxare also described. The results show that stoichiometric parameter x increases with the increase in oxygen partial pressure. The chargedischarge performance of the SnOxfilms is found to be dependent on x value.

  20. Venting temperature determines surface chemistry of magnetron sputtered TiN films

    Energy Technology Data Exchange (ETDEWEB)

    Greczynski, G. [Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping (Sweden); Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Mráz, S.; Schneider, J. M. [Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Hultman, L. [Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping (Sweden)

    2016-01-25

    Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature T{sub v}, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that T{sub v} has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

  1. Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    This study investigated the process parameter effects on the structural and optical properties of ZnO thin film using radio frequency (RF) magnetron sputtering on amorphous glass substrates. The process parameters included RF power and working pressure. Results show that RF power was increased to promote the crystalline quality and decrease ZnO thin film defects. However, when the working pressure was increased to 3 Pa the ZnO thin film crystalline quality became worse. At a 200 W RF power and 1 Pa working pressure, the ZnO thin film with an optical band gap energy of 3.225 eV was obtained.

  2. Structural, electrical, and optical properties of diamondlike carbon films deposited by dc magnetron sputtering

    Science.gov (United States)

    Broitman, E.; Lindquist, O. P. A.; Hellgren, N.; Hultman, L.; Holloway, B. C.

    2003-11-01

    The electrical and optical properties of diamondlike carbon films deposited by direct current magnetron sputtering on Si substrates at room temperature have been measured as a function of the ion energy (Eion) and ion-to-carbon flux (Jion/JC). The results show that, in the ranges of 5 eV<=Eion<=85 eV and 1.1<=Jion/JC<=6.8, the presence of defective graphite formed by subplanted C and Ar atoms, voids, and the surface roughness, are the dominant influences on the resistivity and optical absorption.

  3. Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore, Singapore; Andersson, Joakim; Ni, Pavel; Anders, Andre

    2013-07-17

    Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

  4. Propagation direction reversal of ionization zones in the transition between high and low current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    School of Materials Science and Engineering, State Key Lab for Materials Processing and Die & Mold Technology, Huazhong University of Science and Technology, Wuhan 430074, China; Department of Physics, University of California Berkeley, Berkeley, California 94720, USA; Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA; Yang, Yuchen; Liu, Jason; Liu, Lin; Anders, André

    2014-12-11

    Past research has revealed the propagation of dense, asymmetric ionization zones in both high and low current magnetron discharges. Here we report about the direction reversal of ionization zone propagation as observed with fast cameras. At high currents, zones move in the E B direction with velocities of 103 to 104 m/s. However at lower currents, ionization zones are observed to move in the opposite, the -E B direction, with velocities ~;; 103 m/s. It is proposed that the direction reversal is associated with the local balance of ionization and supply of neutrals in the ionization zone.

  5. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Yuchen [State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Zhou, Xue [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000 (China); Liu, Jason X. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Physics, University of California, Berkeley, Berkeley, California 94720 (United States); Anders, André, E-mail: aanders@lbl.gov [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

    2016-01-18

    We present evidence for breathing modes in magnetron sputtering plasmas: periodic axial variations of plasma parameters with characteristic frequencies between 10 and 100 kHz. A set of azimuthally distributed probes shows synchronous oscillations of the floating potential. They appear most clearly when considering the intermediate current regime in which the direction of azimuthal spoke motion changes. Breathing oscillations were found to be superimposed on azimuthal spoke motion. Depending on pressure and current, one can also find a regime of chaotic fluctuations and one of stable discharges, the latter at high current. A pressure-current phase diagram for the different situations is proposed.

  6. Magnetron sputtering cluster apparatus for formation and deposition of size-selected metal nanoparticles

    DEFF Research Database (Denmark)

    Hanif, Muhammad; Popok, Vladimir

    2015-01-01

    The experimental setup utilizing a DC magnetron sputtering source for production of metal clusters, their size (mass) selection and following deposition in high vacuum is described. The source is capable to form clusters of various metals, for example, copper, silver, gold etc. Cluster size...... selection is achieved using an electrostatic quadrupole mass selector. The deposited silver clusters are studied using atomic force microscopy. The height distributions show typical relative standard size deviation of 9-13% for given sizes in the range between 5-23 nm. Thus, the apparatus demonstrates good...

  7. Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

    Energy Technology Data Exchange (ETDEWEB)

    Ohno, Takahiro; Yagyu, Daisuke; Saito, Shigeru, E-mail: saito@ee.kagu.tus.ac.jp; Ohno, Yasunori; Itoh, Masatoshi; Uhara, Yoshio; Miura, Tsutomu [Department of Electrical Engineering, Faculty of Engineering, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585 (Japan); Nakano, Hirofumi [Ikazuti Ltd., 3-28-10 Kikunodai, Chofu, Tokyo 182-0007 (Japan)

    2015-11-15

    A permanent magnet in a new magnetic field geometry (namely, with the magnetization in the radial direction) was fabricated and used for high-vacuum planar magnetron sputtering using Penning discharge. Because of the development of this magnet, the discharge current and deposition rate were increased two to three times in comparison with the values attainable with a magnet in the conventional geometry. This improvement was because the available space for effective discharge of the energetic electrons for the ionization increased because the magnetic field distribution increased in both the axial and radial directions of discharge.

  8. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  9. STUDY ON Ni-Cr SYSTEM SOLAR SELECTIVE THIN FILMS PREPARED BY MAGNETRON REACTIVE SPUTTERING PROCESS

    Institute of Scientific and Technical Information of China (English)

    B.W. Wang; H. Shen

    2002-01-01

    Ni-Cr System solar selective thin solid films were prepared by d.c. magnetron reactivesputtering under the atmosphere of O2 and N2. Ni-Cr alloy was chosen as targetmaterial and copper sheets as substrate. Using SEM, Spectrophotometer and Talystepto analyze the relations between the selective characteristic and the structure, theformation and the thickness of the thin films. The aim is to obtain good solar selectivethin films with high absorptance and low emittance, which is applied to flat plate solarheat collectors.

  10. Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Wenjie ZHANG; Shenglong ZHU; Ying LI; Fuhui WANG

    2004-01-01

    TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700℃, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800℃. The photocatalytic activity decreased with increasing annealing temperature.

  11. Early Dual Language Learning

    Science.gov (United States)

    Genesee, Fred

    2008-01-01

    Parents and child care personnel in English-dominant parts of the world often express misgivings about raising children bilingually. Their concerns are based on the belief that dual language learning during the infant-toddler stage confuses children, delays their development, and perhaps even results in reduced language competence. In this…

  12. Failures’ Study of a New Character Three-Phase High Voltage Supply for industrial Microwave Generators with one magnetrons per Phase

    Directory of Open Access Journals (Sweden)

    R. Batit

    2016-04-01

    Full Text Available This article treats the development of one of the equivalent electrical models for a single phase power supply for one magnetron; in particular that of its own high voltage (HV transformer newly dimensioned. This single phase system supplies a voltage doubler and current stabilizer circuit, which supplies a single magnetron. Then, by star connecting the three identical models of the single-phase power supply for one magnetron, we obtain a new character three-phase high voltage power supply for industrial microwave generators with one magnetron per phase. The simulation with EMTP (Electro Magnetic Transcients Program in nominal operation has given the theoretical results close to the experimental measurements. Finally, the magnetrons’ failure of the microwave generator was also treated and allowed to observe the interaction’s influence between magnetrons; also the regulation of the anode current has been achieved successfully.

  13. Self-Injection-Locked Magnetron as an Active Ring Resonator Side Coupled to a Waveguide With a Delayed Feedback Loop

    Science.gov (United States)

    Bliokh, Y. P.; Krasik, Y. E.; Felsteiner, J.

    2012-01-01

    The theoretical analysis and numerical simulations of the magnetron operation with a feedback loop were performed assuming that the delay of the electromagnetic wave propagating in the loop is constant whereas the phase of the complex feedback reflection coefficient is varied. Results of simulations showed that by a proper adjustment of values of the time delay and phase of reflection coefficient that determines phase matching between the waves in the resonator and feedback loop, one can increase the magnetron's output power significantly without any other additional measures.

  14. Self-injection-locked magnetron as an active ring resonator side coupled to a waveguide with a delayed feedback loop

    CERN Document Server

    Bliokh, Y P; Felsteiner, J

    2011-01-01

    The theoretical analysis and numerical simulations of the magnetron operation with a feedback loop were performed assuming that the delay of the electromagnetic wave propagating in the loop is constant whereas the phase of the complex feedback reflection coefficient is varied. Results of simulations showed that by a proper adjustment of values of the time delay and phase of reflection coefficient that determines phase matching between the waves in the resonator and feedback loop, one can increase the magnetron's output power significantly without any other additional measures.

  15. Full System Model of Magnetron Sputter Chamber - Proof-of-Principle Study

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C; Gilmer, G; Zepeda-Ruiz, L; Wemhoff, A; Barbee, T

    2007-05-04

    The lack of detailed knowledge of internal process conditions remains a key challenge in magnetron sputtering, both for chamber design and for process development. Fundamental information such as the pressure and temperature distribution of the sputter gas, and the energies and arrival angles of the sputtered atoms and other energetic species is often missing, or is only estimated from general formulas. However, open-source or low-cost tools are available for modeling most steps of the sputter process, which can give more accurate and complete data than textbook estimates, using only desktop computations. To get a better understanding of magnetron sputtering, we have collected existing models for the 5 major process steps: the input and distribution of the neutral background gas using Direct Simulation Monte Carlo (DSMC), dynamics of the plasma using Particle In Cell-Monte Carlo Collision (PIC-MCC), impact of ions on the target using molecular dynamics (MD), transport of sputtered atoms to the substrate using DSMC, and growth of the film using hybrid Kinetic Monte Carlo (KMC) and MD methods. Models have been tested against experimental measurements. For example, gas rarefaction as observed by Rossnagel and others has been reproduced, and it is associated with a local pressure increase of {approx}50% which may strongly influence film properties such as stress. Results on energies and arrival angles of sputtered atoms and reflected gas neutrals are applied to the Kinetic Monte Carlo simulation of film growth. Model results and applications to growth of dense Cu and Be films are presented.

  16. Characteristic comparison of metal films coated onto the cenosphere by chemical and magnetron sputtering methods

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Metal-coated cenospheres have been widely used in Industries. Different coating methods result in different characteristic metal films. Hie metal film on the cenosphere by chemical coating does not appear to be very smooth, exhibiting metal piled up and pin holes on the surface and leaving some spots uncoated. Meanwhile, the metal film is not tightly absorbed onto cenospheres and is easy to peel off. However, the metal film prepared by magnetron sputtering is compact, smooth and without pin holes. The film has good affinity to the cenosphere surface. Such films do not separate with it even when the cenosphere is crushed. Both the metal films give the same XRD patterns, indicating tnat the crystal structure of the metal films by these two methods is the same. Chemical coating is a complex process and harmful to the environment, but it fits ultrafine powder coating (the particle size can be less than 2 μm). The magnetron sputtering method is environmental friendly and works quickly, but this method requires specially designed equipment and does not work for ultrafine powders. If the particle size is less than 30 μm, the coating process is hard to carry on.

  17. Surface functionalization of nanostructured LaB{sub 6}-coated Poly Trilobal fabric by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Yan, E-mail: wuyanchn@hotmail.com [Mechanical and Electrical Engineering Branch, Jiaxing Nanyang Polytechnic Institute, Jiaxing 314003 (China); Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Zhang, Lin, E-mail: zhanglin2007@sdu.edu.cn [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Min, Guanghui, E-mail: ghmin@sdu.edu.cn [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Yu, Huashun; Gao, Binghuan; Liu, Huihui; Xing, Shilong; Pang, Tao [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China)

    2016-10-30

    Highlights: • Nanostructured LaB{sub 6} films were deposited on flexible textile substrates by dc magnetron sputtering. • The pronounced influence of the working pressure on the morphologies and optical properties of LaB{sub 6} films has been revealed. • The concept of Ultraviolet Protection Factor (UPF) was employed and LaB{sub 6}-coated PET textiles with ultraviolet protection ability were obtained. - Abstract: Nanostructured LaB{sub 6} films were deposited on flexible Poly Trilobal substrates (PET textiles) through direct current magnetron sputtering in order to broaden its applications and realize surface functionalization of polyester fabrics. Characterizations and performances were investigated by employing a scanning electron microscope (SEM), Fourier transformation infrared spectroscopy (FT-IR) and ultraviolet-visible (UV–vis) spectrophotometer. Ultraviolet Protection Factor (UPF) conducted by the integral conversion was employed to measure the ultraviolet protection ability. As expected, the growth of LaB{sub 6} film depending on the pressure variation enhanced UV-blocking ability (UPF rating at 30.17) and absorption intensity of the textiles.

  18. Coatings manufactured using magnetron sputtering technology to protect against infrared radiation for use in firefighter helmets

    Directory of Open Access Journals (Sweden)

    Fejdyś Marzena

    2016-09-01

    Full Text Available The aim of this study was to test the usefulness of magnetron sputtering technology to produce coatings on selected elements of a firefighter’s helmet to protect against infrared radiation (PN-EN 171 standard. The scope of research includes testing the deposition produced via magnetron sputtering of metallic and ceramic coatings on plastics, which are used to manufacture the components comprising the personal protection equipment used by firefighters. The UV-VIS, NIR used to research the permeation coefficients and reflections for light and infrared light and the emission spectrometry with ICP-AES used for the quantitative analysis of elements in metallic and ceramic coatings. Microstructural and micro-analytical testing of the coatings were performed using scanning electron microscopy (SEM. Measurements of the chemical compositions were conducted using energy-dispersive X-ray spectroscopy (EDS. The hardnesss of the coatings were tested using a indentation method, and the coating thicknesses were tested using a ellipsometry method.

  19. Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

    Directory of Open Access Journals (Sweden)

    Wojcieszak Damian

    2015-09-01

    Full Text Available Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

  20. Substrate Frequency Effects on Cr x N Coatings Deposited by DC Magnetron Sputtering

    Science.gov (United States)

    Obrosov, Aleksei; Naveed, Muhammad; Volinsky, Alex A.; Weiß, Sabine

    2016-11-01

    Controlled ion bombardment is a popular method to fabricate desirable coating structures and modify their properties. Substrate biasing at high frequencies is a possible technique, which allows higher ion density at the substrate compared with DC current bias. Moreover, high ion energy along with controlled adatom mobility would lead to improved coating growth. This paper focuses on a similar type of study, where effects of coating growth and properties of DC magnetron-sputtered chromium nitride (Cr x N) coatings at various substrate bias frequencies are discussed. Cr x N coatings were deposited by pulsed DC magnetron sputtering on Inconel 718 and (100) silicon substrates at 110, 160 and 280 kHz frequency at low duty cycle. Coating microstructure and morphology were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), scratch adhesion testing and nanoindentation. Results indicate a transformation of columnar into glassy structure of Cr x N coatings with the substrate bias frequency increase. This transformation is attributed to preferential formation of the Cr2N phase at high frequencies compared with CrN at low frequencies. Increase in frequency leads to an increase in deposition rate, which is believed to be due to increase in plasma ion density and energy of the incident adatoms. An increase in coating hardness along with decrease in elastic modulus was observed at high frequencies. Scratch tests show a slight increase in coating adhesion, whereas no clear increase in coating roughness can be found with the substrate bias frequency.

  1. Highly adherent bioactive glass thin films synthetized by magnetron sputtering at low temperature.

    Science.gov (United States)

    Stan, G E; Pasuk, I; Husanu, M A; Enculescu, I; Pina, S; Lemos, A F; Tulyaganov, D U; El Mabrouk, K; Ferreira, J M F

    2011-12-01

    Thin (380-510 nm) films of a low silica content bioglass with MgO, B(2)O(3), and CaF(2) as additives were deposited at low-temperature (150°C) by radio-frequency magnetron sputtering onto titanium substrates. The influence of sputtering conditions on morphology, structure, composition, bonding strength and in vitro bioactivity of sputtered bioglass films was investigated. Excellent pull-out adherence (~73 MPa) was obtained when using a 0.3 Pa argon sputtering pressure (BG-a). The adherence declined (~46 MPa) upon increasing the working pressure to 0.4 Pa (BG-b) or when using a reactive gas mixture (~50 MPa). The SBF tests clearly demonstrated strong biomineralization features for all bioglass sputtered films. The biomineralization rate increased from BG-a to BG-b, and yet more for BG-c. A well-crystallized calcium hydrogen phosphate-like phase was observed after 3 and 15 days of immersion in SBF in all bioglass layers, which transformed monotonously into hydroxyapatite under prolonged SBF immersion. Alkali and alkali-earth salts (NaCl, KCl and CaCO(3)) were also found at the surface of samples soaked in SBF for 30 days. The study indicated that features such as composition, structure, adherence and bioactivity of bioglass films can be tailored simply by altering the magnetron sputtering working conditions, proving that this less explored technique is a promising alternative for preparing implant-type coatings.

  2. Structural Formation and Photocatalytic Activity of Magnetron Sputtered Titania and Doped-Titania Coatings

    Directory of Open Access Journals (Sweden)

    Peter J. Kelly

    2014-10-01

    Full Text Available Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including “conventional” reactive co-sputtering from multiple metal targets and the recently introduced high power impulse magnetron sputtering (HiPIMS. The latter has been shown to deliver a relatively low thermal flux to the substrate, whilst still allowing the direct deposition of crystalline titania coatings and, therefore, offers the potential to deposit photocatalytically active titania coatings directly onto thermally sensitive substrates. The deposition of coatings via these techniques will be discussed, as will the characterisation of the coatings by XRD, SEM, EDX, optical spectroscopy, etc. The assessment of photocatalytic activity and photoactivity through the decomposition of an organic dye (methylene blue, the inactivation of E. coli microorganisms and the measurement of water contact angles will be described. The impact of different deposition technologies, doping and co-doping strategies on coating structure and activity will be also considered.

  3. Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

    Science.gov (United States)

    Dhandapani, Vishnu Shankar; Subbiah, Ramesh; Thangavel, Elangovan; Arumugam, Madhankumar; Park, Kwideok; Gasem, Zuhair M.; Veeraragavan, Veeravazhuthi; Kim, Dae-Eun

    2016-05-01

    Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp2 bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

  4. Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

    Science.gov (United States)

    Strijckmans, K.; Moens, F.; Depla, D.

    2017-02-01

    This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated. From this first study, it becomes clear that the probability to observe hysteresis is much lower as compared to DC magnetron sputtering. The high current pulses cannot explain the hysteresis reduction. Total pressure and material choice make the abrupt changes less pronounced, but the implantation of ionized metal atoms that return to the target seems to be the major cause. To further substantiate these results, the analytical reactive sputtering model is coupled with a published global plasma model. The effect of metal ion implantation is confirmed. Another suggested mechanism, i.e., gas rarefaction, can be ruled out to explain the hysteresis reduction. But perhaps the major conclusion is that at present, there are too little experimental data available to make fully sound conclusions.

  5. Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template

    Science.gov (United States)

    Singh, Ajaib; Schipmann, Susanne; Mathur, Aakash; Pal, Dipayan; Sengupta, Amartya; Klemradt, Uwe; Chattopadhyay, Sudeshna

    2017-08-01

    The structure and morphology of ultra-thin zinc oxide (ZnO) films with different film thicknesses on confined polymer template were studied through X-ray reflectivity (XRR) and grazing incidence small angle X-ray scattering (GISAXS). Using magnetron sputter deposition technique ZnO thin films with different film thicknesses (molecular weight of polystyrene). The detailed internal structure, along the surface/interfaces and the growth direction of the system were explored in this study, which provides insight into the growth procedure of ZnO on confined polymer and reveals that a thin layer of ZnO, with very low surface and interface roughness, can be grown by DC magnetron sputtering technique, with approximately full coverage (with bulk like electron density) even in nm order of thickness, in 2-7 nm range on confined polymer template, without disturbing the structure of the underneath template. The resulting ZnO-polystyrene hybrid systems show strong ZnO near band edge (NBE) and deep-level (DLE) emissions in their room temperature photoluminescence spectra, where the contribution of DLE gets relatively stronger with decreasing ZnO film thickness, indicating a significant enhancement of surface defects because of the greater surface to volume ratio in thinner films.

  6. The structure of Cu-Al films prepared by unbalanced DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Musil, J.; Bell, A.J. [Czech Acad. of Sci., Prague (Czech Republic). Inst. of Phys.; Chepera, M.; Zeman, J. [Military Technical Institute, PO Box 574, 602 00 (Czech Republic)

    1997-11-25

    Recently, the formation of nanostructured and amorphous materials has been the focus of intense research owing to interest from a basic scientific point of view and their potential technological value. This paper reports on the variation in, and control of, the structure of Cu-Al films prepared in a state-of-the-art unbalanced DC magnetron sputtering system. The structure is shown to be considerably influenced by ion bombardment during growth with both the energy and ratio of impinging ions: arriving atoms playing dominant roles. In addition, the addition of different quantities of Al to the thin film is shown to have a dramatic impact on the structure. The conditions under which nanocrystalline Cu-Al films can be prepared are given. The films were deposited by the magnetron sputter ion plating (MSIP) process using negative substrate biases up to 1000 V and at different argon pressures down to 0.04 Pa. The structure of the films were determined from XRD analyses. An attempt to correlate obtained XRD spectra with the structure of the film is suggested. The resistivities of the films were measured using the four-point probe method, whilst the content of Al was determined from EDX measurements. (orig.) 15 refs.

  7. Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow

    Energy Technology Data Exchange (ETDEWEB)

    Nikolaev, A. G.; Vizir, A. V.; Yushkov, G. Yu., E-mail: gyushkov@mail.ru; Frolova, V. P. [High Current Electronics Institute, Siberian Branch of the Russian Academy of Science, Tomsk 634055 (Russian Federation); Oks, E. M. [High Current Electronics Institute, Siberian Branch of the Russian Academy of Science, Tomsk 634055 (Russian Federation); Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050 (Russian Federation)

    2016-02-15

    Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconductor technology, and a composite cathode of lanthanum hexaboride may be suitable for the production of boron ions. We have explored the use of two different approaches to boron plasma production: vacuum arc and planar high power impulse magnetron in self-sputtering mode. For the arc discharge, the boron plasma is generated at cathode spots, whereas for the magnetron discharge, the main process is sputtering of cathode material. We present here the results of comparative test experiments for both kinds of discharge, aimed at determining the optimal discharge parameters for maximum yield of boron ions. For both discharges, the extracted ion beam current reaches hundreds of milliamps and the fraction of boron ions in the total extracted ion beam is as high as 80%.

  8. Corrosion and Nano-mechanical Behaviors of Magnetron Sputtered Al-Mo Gradient Coated Steel

    Science.gov (United States)

    Venugopal, A.; Srinath, J.; Ramesh Narayanan, P.; Sharma, S. C.; Venkitakrishnan, P. V.

    2016-11-01

    A gradient three-layer Al-Mo coating was deposited on steel using magnetron sputtering method. The corrosion and nano-mechanical properties of the coating were examined by electrochemical impedance spectroscopy and nano-indentation tests and compared with the conventional electroplated cadmium and IVD aluminum coatings. Electrochemical impedance spectroscopy was performed by immersing the coated specimens in 3.5% NaCl solution, and the impedance behavior was recorded as a function of immersion time. The mechanical properties (hardness and elastic modulus) were obtained from each indentation as a function of the penetration depth across the coating cross section. The adhesion resistance of the coatings was evaluated by scratch tests on the coated surface using nano-indentation method. The results show that the gradient Al-Mo coating exhibits better corrosion resistance than the other coatings in view of the better microstructure. The impedance results were modeled using appropriate electrical equivalent circuits for all the coated systems. The uniform, smooth and dense Al-Mo coating obtained by magnetron sputtering exhibits good adhesion with the steel substrate as per scratch test method. The poor corrosion resistance of the later coatings was shown to be due to the defects/cracks as well as the lesser adhesion of the coatings with steel. The hardness and elastic modulus of the Al-Mo coating are found to be high when compared to the other coatings.

  9. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    Energy Technology Data Exchange (ETDEWEB)

    Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  10. Study of cobalt mononitride thin films prepared using DC and high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Gupta, Rachana, E-mail: dr.rachana.gupta@gmail.com [Institute of Engineering & Technology, DAVV, Khandwa Road, Indore – 452 017 (India); Pandey, Nidhi; Behera, Layanta; Gupta, Mukul [UGC-DAE Consortium for Scientific Research, Khandwa Road, University Campus, Indore-452001 (India)

    2016-05-23

    In this work we studied cobalt mononitride (CoN) thin films deposited using dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS). A Co target was sputtered using pure N{sub 2} gas alone as the sputtering medium. Obtained long-range structural ordering was studies using x-ray diffraction (XRD), short-range structure using Co L{sub 2,3} and N K absorption edges using soft x-ray absorption spectroscopy (XAS) and the surface morphology using atomic force microscopy (AFM). It was found that HiPIMS deposited films have better long-range ordering, better stoichiometric ratio for mononitride composition and smoother texture as compared to dcMS deposited films. In addition, the thermal stability of HiPIMS deposited CoN film seems to be better. On the basis of different type of plasma conditions generated in HiPIMS and dcMS process, obtained results are presented and discussed.

  11. Codeposition of amorphous zinc tin oxide using high power impulse magnetron sputtering: characterisation and doping

    Science.gov (United States)

    Tran, H. N.; Mayes, E. L. H.; Murdoch, B. J.; McCulloch, D. G.; McKenzie, D. R.; Bilek, M. M. M.; Holland, A. S.; Partridge, J. G.

    2017-04-01

    Thin film zinc tin oxide (ZTO) has been energetically deposited at 100 °C using high power impulse magnetron sputtering (HiPIMS). Reactive co-deposition from Zn (HiPIMS mode) and Sn (DC magnetron sputtering mode) targets yielded a gradient in the Zn:Sn ratio across a 4-inch diameter sapphire substrate. The electrical and optical properties of the film were studied as a function of composition. As-deposited, the films were amorphous, transparent and semi-insulating. Hydrogen was introduced by post-deposition annealing (1 h, 500 °C, 100 mTorr H2) and resulted in significantly increased conductivity with no measurable structural alterations. After annealing, Hall effect measurements revealed n-type carrier concentrations of ∼1 × 1017 cm‑3 and mobilities of up to 13 cm2 V‑1 s–1. These characteristics are suitable for device applications and proved stable. X-ray photoelectron spectroscopy was used to explore the valence band structure and to show that downward surface band-bending resulted from OH attachment. The results suggest that HiPIMS can produce dense, high quality amorphous ZTO suitable for applications including transparent thin film transistors.

  12. Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-11-22

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

  13. -AgCoO2/-ZnO heterojunction diode grown by rf magnetron sputtering

    Indian Academy of Sciences (India)

    K A Vanaja; Umananda M Bhatta; R S Ajimsha; S Jayalekshmi; M K Jayaraj

    2008-10-01

    -type transparent semiconducting AgCoO2 thin films were deposited by rf magnetron sputtering of sintered AgCoO2 target. The AgCoO2 films grown by rf sputtering were highly -axis oriented showing only (001) reflections in the X-ray diffraction pattern unlike in the case of amorphous films grown by pulsed laser deposition (PLD). The bulk powder of AgCoO2 was synthesized by hydrothermal process. The optical bandgap was estimated as 4.15 eV and has a transmission of about 50% in the visible region. The temperature dependence of conductivity shows a semiconducting behaviour. The positive sign of Seebeck coefficient (+220 VK–1) indicates -type conductivity. Transparent – heterojunction on glass substrate was fabricated by rf magnetron sputtering of -AgCoO2 and -type ZnO : Al thin films. The structure of the diode was glass/ITO/-ZnO/-AgCoO2. The junction between -AgCoO2 and -ZnO was found to be rectifying.

  14. Dependence of the open-closed field line boundary in Saturn's ionosphere on both the IMF and solar wind dynamic pressure: comparison with the UV auroral oval observed by the HST

    Directory of Open Access Journals (Sweden)

    E. S. Belenkaya

    2008-02-01

    Full Text Available We model the open magnetic field region in Saturn's southern polar ionosphere during two compression regions observed by the Cassini spacecraft upstream of Saturn in January 2004, and compare these with the auroral ovals observed simultaneously in ultraviolet images obtained by the Hubble Space Telescope. The modelling employs the paraboloid model of Saturn's magnetospheric magnetic field, whose parameters are varied according to the observed values of both the solar wind dynamic pressure and the interplanetary magnetic field (IMF vector. It is shown that the open field area responds strongly to the IMF vector for both expanded and compressed magnetic models, corresponding to low and high dynamic pressure, respectively. It is also shown that the computed open field region agrees with the poleward boundary of the auroras as well as or better than those derived previously from a model in which only the variation of the IMF vector was taken into account. The results again support the hypothesis that the auroral oval at Saturn is associated with the open-closed field line boundary and hence with the solar wind interaction.

  15. IMF dependence of the open-closed field line boundary in Saturn's ionosphere, and its relation to the UV auroral oval observed by the Hubble Space Telescope

    Directory of Open Access Journals (Sweden)

    E. S. Belenkaya

    2007-06-01

    Full Text Available We study the dependence of Saturn's magnetospheric magnetic field structure on the interplanetary magnetic field (IMF, together with the corresponding variations of the open-closed field line boundary in the ionosphere. Specifically we investigate the interval from 8 to 30 January 2004, when UV images of Saturn's southern aurora were obtained by the Hubble Space Telescope (HST, and simultaneous interplanetary measurements were provided by the Cassini spacecraft located near the ecliptic ~0.2 AU upstream of Saturn and ~0.5 AU off the planet-Sun line towards dawn. Using the paraboloid model of Saturn's magnetosphere, we calculate the magnetospheric magnetic field structure for several values of the IMF vector representative of interplanetary compression regions. Variations in the magnetic structure lead to different shapes and areas of the open field line region in the ionosphere. Comparison with the HST auroral images shows that the area of the computed open flux region is generally comparable to that enclosed by the auroral oval, and sometimes agrees in detail with its poleward boundary, though more typically being displaced by a few degrees in the tailward direction.

  16. Dual-readout Calorimetry

    CERN Document Server

    Akchurin, N; Cardini, A.; Cascella, M.; Cei, F.; De Pedis, D.; Fracchia, S.; Franchino, S.; Fraternali, M.; Gaudio, G.; Genova, P.; Hauptman, J.; La Rotonda, L.; Lee, S.; Livan, M.; Meoni, E.; Moggi, A.; Pinci, D.; Policicchio, A.; Saraiva, J.G.; Sill, A.; Venturelli, T.; Wigmans, R.

    2013-01-01

    The RD52 Project at CERN is a pure instrumentation experiment whose goal is to un- derstand the fundamental limitations to hadronic energy resolution, and other aspects of energy measurement, in high energy calorimeters. We have found that dual-readout calorimetry provides heretofore unprecedented information event-by-event for energy resolution, linearity of response, ease and robustness of calibration, fidelity of data, and particle identification, including energy lost to binding energy in nuclear break-up. We believe that hadronic energy resolutions of {\\sigma}/E $\\approx$ 1 - 2% are within reach for dual-readout calorimeters, enabling for the first time comparable measurement preci- sions on electrons, photons, muons, and quarks (jets). We briefly describe our current progress and near-term future plans. Complete information on all aspects of our work is available at the RD52 website http://highenergy.phys.ttu.edu/dream/.

  17. Higher Representations Duals

    DEFF Research Database (Denmark)

    Sannino, Francesco

    2010-01-01

    We uncover novel solutions of the 't Hooft anomaly matching conditions for scalarless gauge theories with matter transforming according to higher dimensional representations of the underlying gauge group. We argue that, if the duals exist, they are gauge theories with fermions transforming...... according to the defining representation of the dual gauge group. The resulting conformal windows match the one stemming from the all-orders beta function results when taking the anomalous dimension of the fermion mass to be unity which are also very close to the ones obtained using the Schwinger......-Dyson approximation. We use the solutions to gain useful insight on the conformal window of the associated electric theory. A consistent picture emerges corroborating previous results obtained via different analytic methods and in agreement with first principle lattice explorations....

  18. Dual Campus High School

    Directory of Open Access Journals (Sweden)

    Carmen P. Mombourquette

    2013-04-01

    Full Text Available September 2010 witnessed the opening of the first complete dual campus high school in Alberta. Catholic Central High School, which had been in existence since 1967 in one building, now offered courses to students on two campuses. The “dual campus” philosophy was adopted so as to ensure maximum program flexibility for students. The philosophy, however, was destined to affect student engagement and staff efficacy as the change in organizational structure, campus locations, and course availability was dramatic. Changing school organizational structure also had the potential of affecting student achievement. A mixed-methods study utilizing engagement surveys, efficacy scales, and interviews with students and teachers was used to ascertain the degree of impact. The results of the study showed that minimal impact occurred to levels of student engagement, minor negative impact to staff efficacy, and a slight increase to student achievement results.

  19. Dual Double Field Theory

    CERN Document Server

    Bergshoeff, Eric A; Penas, Victor A; Riccioni, Fabio

    2016-01-01

    We present the dual formulation of double field theory at the linearized level. This is a classically equivalent theory describing the duals of the dilaton, the Kalb-Ramond field and the graviton in a T-duality or O(D,D) covariant way. In agreement with previous proposals, the resulting theory encodes fields in mixed Young-tableau representations, combining them into an antisymmetric 4-tensor under O(D,D). In contrast to previous proposals, the theory also requires an antisymmetric 2-tensor and a singlet, which are not all pure gauge. The need for these additional fields is analogous to a similar phenomenon for "exotic" dualizations, and we clarify this by comparing with the dualizations of the component fields. We close with some speculative remarks on the significance of these observations for the full non-linear theory yet to be constructed.

  20. Dual-comb MIXSEL

    Science.gov (United States)

    Link, S. M.; Zaugg, C. A.; Klenner, A.; Mangold, M.; Golling, M.; Tilma, B. W.; Keller, U.

    2015-03-01

    We present a single semiconductor disk laser simultaneously emitting two different gigahertz modelocked pulse trains. A birefringent crystal inside a modelocked integrated external-cavity surface-emitting laser (MIXSEL) separates the cavity beam into two spatially separated beams with perpendicular polarizations on the MIXSEL chip. This MIXSEL then generates two orthogonally polarized collinear modelocked pulse trains from one simple straight cavity. Superimposing the beams on a photo detector creates a microwave beat signal, representing a strikingly simple setup to down-convert the terahertz optical frequencies into the electronically accessible microwave regime. This makes the dual-comb MIXSEL scheme an ultra-compact and cost-efficient candidate for dual-comb spectroscopy applications.

  1. Dual-readout Calorimetry

    OpenAIRE

    Akchurin, N.; Bedeschi, F.; Cardini, A.; Cascella, M.; Cei, F.; Pedis, D.; Fracchia, S.; Franchino, S.; Fraternali, M.; Gaudio, G.; P. Genova; Hauptman, J.; La Rotonda, L.; Lee, S.; Livan, M.(INFN Sezione di Pavia, Pavia, Italy)

    2013-01-01

    The RD52 Project at CERN is a pure instrumentation experiment whose goal is to understand the fundamental limitations to hadronic energy resolution, and other aspects of energy measurement, in high energy calorimeters. We have found that dual-readout calorimetry provides heretofore unprecedented information event-by-event for energy resolution, linearity of response, ease and robustness of calibration, fidelity of data, and particle identification, including energy lost to binding energy in n...

  2. Dual-Schemata Model

    Science.gov (United States)

    Taniguchi, Tadahiro; Sawaragi, Tetsuo

    In this paper, a new machine-learning method, called Dual-Schemata model, is presented. Dual-Schemata model is a kind of self-organizational machine learning methods for an autonomous robot interacting with an unknown dynamical environment. This is based on Piaget's Schema model, that is a classical psychological model to explain memory and cognitive development of human beings. Our Dual-Schemata model is developed as a computational model of Piaget's Schema model, especially focusing on sensori-motor developing period. This developmental process is characterized by a couple of two mutually-interacting dynamics; one is a dynamics formed by assimilation and accommodation, and the other dynamics is formed by equilibration and differentiation. By these dynamics schema system enables an agent to act well in a real world. This schema's differentiation process corresponds to a symbol formation process occurring within an autonomous agent when it interacts with an unknown, dynamically changing environment. Experiment results obtained from an autonomous facial robot in which our model is embedded are presented; an autonomous facial robot becomes able to chase a ball moving in various ways without any rewards nor teaching signals from outside. Moreover, emergence of concepts on the target movements within a robot is shown and discussed in terms of fuzzy logics on set-subset inclusive relationships.

  3. Thickness effect on properties of titanium film deposited by d.c. magnetron sputtering and electron beam evaporation techniques

    Indian Academy of Sciences (India)

    Nishat Arshi; Junqing Lu; Chan Gyu Lee; Jae Hong Yoon; Bon Heun Koo; Faheem Ahmed

    2013-10-01

    This paper reports effect of thickness on the properties of titanium (Ti) film deposited on Si/SiO2 (100) substrate using two different methods: d.c. magnetron sputtering and electron beam (e-beam) evaporation technique. The structural and morphological characterization of Ti film were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). XRD pattern revealed that the films deposited using d.c. magnetron sputtering have HCP symmetry with preferred orientation along (002) plane, while those deposited with e-beam evaporation possessed fcc symmetry with preferred orientation along (200) plane. The presence of metallic Ti was also confirmed by XPS analysis. FESEM images depicted that the finite sized grains were uniformly distributed on the surface and AFM micrographs revealed roughness of the film. The electrical resistivity measured using four-point probe showed that the film deposited using d.c. magnetron sputtering has lower resistivity of ∼13 cm than the film deposited using e-beam evaporation technique, i.e. ∼60 cm. The hardness of Ti films deposited using d.c. magnetron sputtering has lower value (∼7.9 GPa) than the film deposited using e-beam technique (∼9.4 GPa).

  4. Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis

    Science.gov (United States)

    Parkhomenko, H. P.; Solovan, M. N.; Mostovoi, A. I.; Orletskii, I. G.; Parfenyuk, O. A.; Maryanchuk, P. D.

    2017-06-01

    Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.

  5. Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

    NARCIS (Netherlands)

    Martinez-Martinez, D.; Lopez-Cartes, C.; Fernandez, A.; Sanchez-Lopez, J. C.

    2013-01-01

    The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N-2 atmosphere vs. the comparatively more simple sputtering

  6. Effects of dopant concentration and impurities on the conductivity of magnetron-sputtered nanocrystalline yttria-stabilized zirconia

    DEFF Research Database (Denmark)

    Sillassen, M.; Eklund, P.; Pryds, Nini;

    2010-01-01

    Cubic yttria-stabilized zirconia (YSZ) films with yttria concentrations of 8.7, 9.9, and 11 mol% have been deposited by reactive pulsed DC magnetron from Zr–Y alloy targets. The overall microstructure and texture in the films showed no dependence on the yttria concentration. Films deposited at fl...

  7. The influence of N2 flow rate on Ar and Ti Emission in high-pressure magnetron sputtering system plasma

    Science.gov (United States)

    How, Soo Ren; Nayan, Nafarizal; Lias, Jais

    2017-03-01

    For ionized physical vapor deposition (known as IPVD) technique, investigation on the ionization mechanism of titanium atoms is very important during the deposition of titanium nitride (TiN) thin film using reactive magnetron sputtering plasma. The introduction of nitrogen gas into the chamber discharge leads to modifications of plasma parameters and ionization mechanism of transition species. In this work, an investigation on the influence of nitrogen flow rate on spectrum properties of argon and titanium during the deposition process have been carried out. The experimental configuration consists of OES and structure of magnetron sputtering device with the turbo molecular pump. A high-pressure magnetron sputtering plasma was used as plasma discharge chamber with various flow rate of nitrogen gas. Optical emission spectroscopy (OES) measurements were employed as plasma diagnostics tool in magnetron sputtering plasma operated at relatively high pressure. OES is a non-invasive plasma diagnostics method and that can detect the atomic and ionic emission during plasma discharge. The flow rate of the Ar and N2 gas are controlled by mass flow controller. The changes of relative emission for both neutral and ionic of argon as well as titanium were observed using optical spectrometer when the nitrogen gas is introduced into the discharged chamber. We found that the titanium emission decreased very rapidly with the flow rate of nitrogen. In addition, the argon emission slightly decreased with the flow rate of nitrogen.

  8. Combined optical emission and resonant absorption diagnostics of an Ar-O{sub 2}-Ce-reactive magnetron sputtering discharge

    Energy Technology Data Exchange (ETDEWEB)

    El Mel, A.A. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Institut des Matériaux Jean Rouxel, Université de Nantes, CNRS, 2 rue de la Houssinière B.P. 32229, Nantes Cedex 3 44322 (France); Ershov, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Britun, N., E-mail: nikolay.britun@umons.ac.be [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Ricard, A. [Université de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, Toulouse Cedex 9 F-31062 (France); Konstantinidis, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Snyders, R. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Materia Nova Research Center, Parc Initialis, Avenue Copernic 1, Mons B-7000 (Belgium)

    2015-01-01

    We report the results on combined optical characterization of Ar-O{sub 2}-Ce magnetron sputtering discharges by optical emission and resonant absorption spectroscopy. In this study, a DC magnetron sputtering system equipped with a movable planar magnetron source with a Ce target is used. The intensities of Ar, O, and Ce emission lines, as well as the absolute densities of Ar metastable and Ce ground state atoms are analyzed as a function of the distance from the magnetron target, applied DC power, O{sub 2} content, etc. The absolute number density of the Ar{sup m} is found to decrease exponentially as a function of the target-to-substrate distance. The rate of this decrease is dependent on the sputtering regime, which should be due to the different collisional quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents. Quantitatively, the absolute number density of Ar{sup m} is found to be equal to ≈ 3 × 10{sup 8} cm{sup −3} in the metallic, and ≈ 5 × 10{sup 7} cm{sup −3} in the oxidized regime of sputtering, whereas Ce ground state densities at the similar conditions are found to be few times lower. The absolute densities of species are consistent with the corresponding deposition rates, which decrease sharply during the transition from metallic to poisoned sputtering regime. - Highlights: • Optical emission and resonant absorption spectroscopy are employed to study Ar-O{sub 2}-Ce magnetron sputtering discharges. • The density of argon metastables is found to decrease exponentially when increasing the target-to-substrate distance. • The collision-quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents is demonstrated. • The deposition rates of cerium and cerium oxide thin films decrease sharply during the transition from the metallic to the poisoned sputtering regime.

  9. Microstructure and temperature coefficient of resistance of thin cermet resistor films deposited from CrSi{sub 2}-Cr-SiC targets by S-gun magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Felmetsger, Valery V. [Tegal Corporation, 51 Daggett Drive, San Jose, California 95134 (United States)

    2010-01-15

    Technological solutions for producing nanoscale cermet resistor films with sheet resistances above 1000 {Omega}/{open_square} and low temperature coefficients of resistance (TCR) have been investigated. 2-40 nm thick cermet films were sputter deposited from CrSi{sub 2}-Cr-SiC targets by a dual cathode dc S-gun magnetron. In addition to studying film resistance versus temperature, the nanofilm structural features and composition were analyzed using scanning electron microscopy, atomic force microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and electron energy loss spectroscopy. This study has revealed that all cermet resistor films deposited at ambient and elevated temperatures were amorphous. The atomic ratio of Si to Cr in these films was about 2 to 1. The film TCR displayed a significant increase when the deposited film thickness was reduced below 2.5 nm. An optimized sputter process consisting of wafer degassing, cermet film deposition at elevated temperature with rf substrate bias, and a double annealing in vacuum, consisting of in situ annealing following the film sputtering and an additional annealing following the exposure of the wafers to air, has been found to be very effective for the film thermal stabilization and for fine tuning the film TCR. Cermet films with thicknesses in the range of 2.5-4 nm deposited using this technique had sheet resistances ranging from 1800 to 1200 {Omega}/{open_square} and TCR values from -50 ppm/ deg. C to near zero, respectively. A possible mechanism responsible for the high efficiency of annealing the cermet films in vacuum (after preliminary exposure to air), resulting in resistance stabilization and TCR reduction, is also discussed.

  10. EFFECT OF MAGNETRON-SPUTTERED Al FILM ON LOW-TEMPERATURE PACK-ALUMINIZING COATING FOR OIL CASING STEEL N80

    OpenAIRE

    MIN HUANG; YU WANG; MENG-XIAN ZHANG; YAN-QIU HUO; PENG-JIN GAO

    2014-01-01

    Low-temperature aluminizing coating was prepared onto the surface of oil casing steel N80 with a magnetron-sputtered Al film to improve its corrosion resistance. Results show that magnetron-sputtered Al film is able to form gradient aluminide coating, composed of iron aluminide FeAl3, Fe2Al5 and Fe3Al with different contents of aluminum. Both the density and continuity of iron aluminide layer for oil casing steel N80 with magnetron-sputtered Al film can be improved. Under the same corrosion c...

  11. Alexander Duals of Multipermutohedron Ideals

    Indian Academy of Sciences (India)

    Ajay Kumar; Chanchal Kumar

    2014-02-01

    An Alexander dual of a multipermutohedron ideal has many combinatorial properties. The standard monomials of an Artinian quotient of such a dual correspond bijectively to some -parking functions, and many interesting properties of these Artinian quotients are obtained by Postnikov and Shapiro (Trans. Am. Math. Soc. 356 (2004) 3109–3142). Using the multigraded Hilbert series of an Artinian quotient of an Alexander dual of multipermutohedron ideals, we obtained a simple proof of Steck determinant formula for enumeration of -parking functions. A combinatorial formula for all the multigraded Betti numbers of an Alexander dual of multipermutohedron ideals are also obtained.

  12. Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs

    Directory of Open Access Journals (Sweden)

    T. Hill

    2011-01-01

    Full Text Available Submicron thin yttria stabilized zirconia (YSZ films were prepared on a variety of substrates with different surface morphologies by magnetron sputtering followed by thermal oxidation. Pinholes were observed in the films deposited on nanoporous alumina substrates. Initial dense Y/Zr films developed nanocracks after thermal oxidation on smooth Si wafer substrates. At optimal sputtering and oxidation conditions, smooth and crack/pore-free films were achieved on Si wafer substrates. The thin YSZ films exhibited fully ionic conduction with ionic conductivities, and activation energy corroborated well with the values from commercial YSZ plates. The thin YSZ films can be utilized in Solid Oxide Fuel Cells (SOFCs for intermediate temperature operations.

  13. Current-pressure dependencies of dc magnetron discharge in inert gases

    Science.gov (United States)

    Serov, A. O.; Mankelevich, Yu A.; Pal, A. F.; Ryabinkin, A. N.

    2016-11-01

    The current-pressure (I-P) characteristics of dc magnetron discharge in inert gases (Ar, Kr and Xe) for various constant discharge voltages were measured. Under certain conditions on I-P characteristic, the nonmonotonic region of local maximum followed by a minimum is observed. It is found that increasing mass of the working gas ions results in a shift of the local maximum to lower pressures. The spatial distribution of ions in the plasma was studied by optical emission spectroscopy. Transformation of the discharge spatial structure with pressure was observed. A qualitative model of the observed trends is presented. It takes into account the pressure dependence of the discharge spatial structure, the capturing of secondary electrons by the cathode and charge exchange effects.

  14. Control over the preferred orientation of CIGS films deposited by magnetron sputtering using a wetting layer

    Science.gov (United States)

    Yan, Yong; Jiang, Fan; Liu, Lian; Yu, Zhou; Zhang, Yong; Zhao, Yong

    2016-01-01

    A growth method is presented to control the preferred orientation in chalcopyrite CuIn x Ga1- x Se2 (CIGS) thin films grown by magnetron sputtering. Films with (220/204) and (112) preferred orientation as well as randomly oriented films were prepared. The effects of an In2Se3 wetting layer and the working pressure on the texture transition phenomena were examined. A large-grained CIGS film with (220/204) texture was formed at 400°C with the inclusion of a thin (80 nm) In2Se3 layer and liquid phase (excess copper selenide phase) formation, and the reaction mechanism is proposed. The device deposited at 2.0 Pa on an In2Se3 layer exhibited the optimal electrical properties. [Figure not available: see fulltext.

  15. RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

    Directory of Open Access Journals (Sweden)

    Siming Chen

    2013-01-01

    Full Text Available Aluminum oxide films were deposited on crystalline silicon substrates by reactive RF magnetron sputtering. The influences of the deposition parameters on the surface passivation, surface damage, optical properties, and composition of the films have been investigated. It is found that proper sputtering power and uniform magnetic field reduced the surface damage from the high-energy ion bombardment to the silicon wafers during the process and consequently decreased the interface trap density, resulting in the good surface passivation; relatively high refractive index of aluminum oxide film is benefic to improve the surface passivation. The negative-charged aluminum oxide film was then successfully prepared. The surface passivation performance was further improved after postannealing by formation of an SiOx interfacial layer. It is demonstrated that the reactive sputtering is an effective technique of fabricating aluminum oxide surface passivation film for low-cost high-efficiency crystalline silicon solar cells.

  16. Characterization of nanostructured Ti-B-(N) coatings produced by direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lopez-Cartes, C. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla (Spain)]. E-mail: clopez@icmse.csic.es; Martinez-Martinez, D. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla (Spain); Sanchez-Lopez, J.C. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla (Spain); Fernandez, A. [Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla), Avda. Americo Vespucio 49, 41092 Sevilla (Spain); Garcia-Luis, A. [Fundacion INASMET, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); Brizuela, M. [Fundacion INASMET, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain); Onate, J.I. [Fundacion INASMET, Mikeletegi Pasealekua 2, 20009 Donostia-San Sebastian (Spain)

    2007-02-26

    A series of Ti-B-(N) coatings prepared by dc magnetron sputtering using TiB{sub 2} targets in Ar/N{sub 2} gas mixtures has been chemically and structurally characterized by transmission electron microscopy, X-ray diffraction, electron energy-loss spectroscopy, and X-ray photoelectron spectroscopy. The influence of synthesis parameters such as applied heating power and nitrogen flow on the structure and chemical composition of the coatings has been studied. Independently of the experimental conditions employed during the synthesis, hexagonal TiB{sub 2} is the main crystalline phase present in the coatings. The use of N{sub 2} leads to the formation of an amorphous mixture of BN/TiN phases, as well as a diminution of the TiB{sub 2} crystalline phase. The influence of the composition and structure of the coatings on their hardness is also discussed.

  17. Coating multilayer material with improved tribological properties obtained by magnetron sputtering

    Science.gov (United States)

    Mateescu, A. O.; Mateescu, G.; Balasoiu, M.; Pompilian, G. O.; Lungu, M.

    2017-02-01

    This work is based on the Patent no. RO 128094 B1, granted by the Romanian State Office for Inventions and Trademarks. The goal of the work is to obtain for investigations tribological coatings with multilayer structure with improved tribological properties, deposited by magnetron sputtering process from three materials (sputtering targets). Starting from compound chemical materials (TiC, TiB2 and WC), as sputtering targets, by deposition in argon atmosphere on polished stainless steel, we have obtained, based on the claims of the above patent, thin films of multilayer design with promising results regarding their hardness, elastic modulus, adherence, coefficient of friction and wear resistance. The sputtering process took place in a special sequence in order to ensure better tribological properties to the coating, comparing to those of the individual component materials. The tribological properties, such as the coefficient of friction, are evaluated using the tribometer test.

  18. Dielectric properties of tetragonal tungsten bronze films deposited by RF magnetron sputtering

    Science.gov (United States)

    Bodeux, Romain; Michau, Dominique; Josse, Michaël; Maglione, Mario

    2014-12-01

    Tetragonal tungsten bronze (TTB) films have been synthesised on Pt(111)/TiO2/SiO2/Si substrates from Ba2LnFeNb4O15 ceramics (Ln = La, Nd, Eu) by RF magnetron sputtering. X-ray diffraction measurements evidenced the multi-oriented nature of films with some degrees of preferential orientation along (111). The dependence of the dielectric properties on temperature and frequency has been investigated. The dielectric properties of the films are similar to those of the bulk, i.e., ɛ ˜150 and σ ˜10-6 Ω-1 cm-1 at 1 MHz and room temperature. The films exhibit two dielectric anomalies which are attributed to Maxwell Wagner polarization mechanism and relaxor behaviour. Both anomalies are sensitive to post-annealing under oxygen atmosphere and their activation energies are similar Ea ˜0.30 eV. They are explained in terms of electrically heterogeneous contributions in the films.

  19. Characterization of hydrogenated and deuterated thin carbon films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Pantelica, D., E-mail: pantel@nipne.ro [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, 30 Reactorului St., RO 077125 Magurele (Romania); Ionescu, P.; Petrascu, H. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, 30 Reactorului St., RO 077125 Magurele (Romania); Nita, C.R. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, 30 Reactorului St., RO 077125 Magurele (Romania); University Politehnica of Bucharest, RO 060042 Bucharest (Romania); Matei, E.; Rasoga, O. [National Institute for Materials Physics, 105 Atomistilor Str., RO 077125 Magurele-Bucharest (Romania); Acsente, T.; Dinescu, G. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO 077125 Magurele-Bucharest (Romania)

    2014-07-15

    Thin films of C layers were deposited by radiofrequency magnetron sputtering on silicon substrates using three gaseous atmospheres: pure Ar, Ar + H{sub 2} and Ar + D{sub 2} mixtures. Scanning Electron Microscopy investigations showed that addition of D{sub 2} or H{sub 2} to main sputtering gas (Ar) leads to the enhancement of the deposition rate while the layer morphology remained columnar. Fourier Transform Infrared Spectroscopy measurements revealed the presence of D–C or H–C chemical bonds in the samples. Ion beam analysis measurements performed by simultaneous recording of the recoiled H and D ions, and of backscattered {sup 4}He confirmed the incorporation of hydrogen and deuterium in the deposited carbon thin films.

  20. Experimental investigation on photoelectric properties of ZAO thin film deposited on flexible substrate by magnetron sputtering

    Science.gov (United States)

    Hao, Ming; Liu, Kun; Liu, Xinghua; Wang, Dongyang; Ba, Dechun; Xie, Yuanhua; Du, Guangyu; Ba, Yaoshuai

    2016-12-01

    Transparent conductive ZAO (Zinc Aluminum Oxide) films on flexible substrates have a great potential for low-cost mass-production solar cells. ZAO thin films were achieved on flexible PET (polyethylene terephthalate) substrates by RF magnetron sputtering technology. The surface morphology and element content, the transmittance and the sheet resistance of the films were measured to determine the optical process parameters. The results show that the ZAO thin film shows the best parameters in terms of photoelectric performance including sputtering power, working pressure, sputtering time, substrate temperature (100 W, 1.5 Pa, 60 min, 125 °C). The sheet resistance of 510 Ω and transmittance in visible region of 92% were obtained after characterization. Surface morphology was uniform and compact with a good crystal grain.

  1. Characterization of ZrO2 Films Deposited by Reactive Unbalanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHAO Sha; XU Ke-wei; WANG Yuan

    2004-01-01

    ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil current of 0.2A, small grains are produced. With the increase of coil current, the deposition rate and surface roughness are decreased and the packing density in proportion to the refractive index is increased remarkably. The refractive index is as high as 2.236 (at λ=600nm) at 0.4A. At the high coil current of 0.6A, grains appear to grow up due to thermal effects and therefore optical properties of the films are deteriorated a little.

  2. Nanoscale Multilayered ZrAlN/ZrB2 Coatings Synthesized by Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Dejun LI

    2006-01-01

    Multilayered ZrAlN/ZrB2 coatings containing alternating bilayer periods were synthesized by dc magnetron sputtering technique. The intensities of ZrN (111) or ZrN (200) textures in the structure of the nanolayers depended on the bilayer period as well as N2 gas partial pressure during deposition. Nanoindentation testing showed that hardness and internal stress of the nanolayers varied with the bilayer period and crystallographic orientation in the coatings. The hardness of the nanolayers with bilayer periods of 3~6 nm was enhanced (~27%) over the rule-of-mixture value. A low percent of N2 in processing gas was proved to be benefitial to the synthesis of high hard nanoscale multilayered coatings.

  3. Manufacturing of HfOxNy films using reactive magnetron sputtering for ISFET application

    Science.gov (United States)

    Firek, Piotr; Wysokiński, Piotr

    2016-12-01

    Hafnium Oxide-Nitride films were deposited using reactive magnetron sputtering in O2/N2/Ar gas mixture. Deposition was planned according to Taguchi optimization method. Morphology of fabricated layers was tested using AFM technique (Ra=0.2÷1,0 nm). Thickness of HfOXNY films was measured using spectroscopic ellipsometry (t=45÷54 nm). Afterwards MIS structures were created by Al metallization process then layers were electrically characterised using I-V and C-V measurements. This allowed to calculate the electrical parameters of layers such as: flat-band voltage UFB, dielectric constant Ki, interface state trap density Dit and effective charge Qeff. Subsequently, deposited HfOxNy layers were annealed in PDA process (40 min 400 °C 100% N2) after which the electrical characterization was performed again.

  4. Nitrogen Contents on Tribological Properties of Magnetron Sputtered SiCN Coatings

    Institute of Scientific and Technical Information of China (English)

    TIETUNSUN; Y.Q.FU; J.WEI; H.J.DU

    2004-01-01

    Silicon carbonitride (SiCN) coatings were deposited on silicon and tungsten carbide substrates by co-sputtering silicon and carbon in argon and nitrogen mixture atmosphere using magnetron-sputtering system. The effect of the N2 concentration, RF substrate bias voltage and target current on film deposition rate, roughness, adhesion, mechanical and tribological properties of coatings were investigated. The deposition rate was found to increase with the increasing nitrogen concentration. X-ray photoelectron spectroscopy analysis showed that high nitrogen concentration in the nitrogen-argon gas mixture enhanced the incorporation of C and N but reduced the incorporation of Si. SiCN coatings have good tribological properties at a N2 concentration of approximately 60%.

  5. Bimodal substrate biasing to control \\gamma-Al2O3 deposition during reactive magnetron sputtering

    CERN Document Server

    Prenzel, Marina; Stein, Adrian; von Keudell, Achim; Nahif, Farwah; Schneider, Jochen M

    2013-01-01

    Al2O3 thin films have been deposited at substrate temperatures between 500{\\deg}C to 600{\\deg}C by reactive magnetron sputtering using an additional arbitrary substrate bias to tailor the energy distribution of the incident ions. The films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR). The film structure being amorphous, nanocrystalline, or crystalline was correlated with characteristic ion energy distributions. The evolving crystalline structure is connected with different levels of displacements per atom (dpa) in the growing film as being derived from TRIM simulations. The boundary between the formation of crystalline films and amorphous or nanocrystalline films was at 0.9 dpa for a substrate temperature of 500{\\deg}C. This threshold shifts to 0.6 dpa for films grown at 550{\\deg}C.

  6. Reduction in plasma potential by applying negative DC cathode bias in RF magnetron sputtering

    Science.gov (United States)

    Isomura, Masao; Yamada, Toshinori; Osuga, Kosuke; Shindo, Haruo

    2016-11-01

    We applied a negative DC bias voltage to the cathode of an RF magnetron sputtering system and successfully reduced the plasma potential in both argon plasma and hydrogen-diluted argon plasma. The crystallinity of the deposited Ge films is improved by increasing the negative DC bias voltage. It is indicated that the reduction in plasma potential is effective for reducing the plasma damage on deposited materials, caused by the electric potential between the plasma and substrates. In addition, the deposition rate is increased by the increased electric potential between the plasma and the cathode owing to the negative DC bias voltage. The present method successfully gives us higher speed and lower damage sputtering deposition. The increased electric potential between the plasma and the cathode suppresses the evacuation of electrons from the plasma and also enhances the generation of secondary electrons on the cathode. These probably suppress the electron loss from the plasma and result in the reduction in plasma potential.

  7. FTO films deposited in transition and oxide modes by magnetron sputtering using tin metal target.

    Science.gov (United States)

    Liao, Bo-Huei; Chan, Shih-Hao; Lee, Cheng-Chung; Kuo, Chien-Cheng; Chen, Sheng-Hui; Chiang, Donyau

    2014-02-01

    Fluorine-doped tin oxide (FTO) films were prepared by pulsed DC magnetron sputtering with a metal Sn target. Two different modes were applied to deposit the FTO films, and their respective optical and electrical properties were evaluated. In the transition mode, the minimum resistivity of the FTO film was 1.63×10(-3)  Ω cm with average transmittance of 80.0% in the visible region. Furthermore, FTO films deposited in the oxide mode and mixed simultaneously with H2 could achieve even lower resistivity to 8.42×10(-4)  Ω cm and higher average transmittance up to 81.1% in the visible region.

  8. Hydroxyapatite coatings on nanotubular titanium dioxide thin films prepared by radio frequency magnetron sputtering.

    Science.gov (United States)

    Shin, Jinho; Lee, Kwangmin; Koh, Jeongtae; Son, Hyeju; Kim, Hyunseung; Lim, Hyun-Pil; Yun, Kwidug; Oh, Gyejeong; Lee, Seokwoo; Oh, Heekyun; Lee, Kyungku; Hwang, Gabwoon; Park, Sang-Won

    2013-08-01

    In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface, anodized Ti surface, as-sputtered HA coating on the anodized Ti surface, and heat-treated HA coating on the anodized Ti surface were prepared. The samples were characterized using scanning electron microscopy and X-ray photoemission spectroscopy, and biologic responses were evaluated. The top of the TiO2 nanotubes was not closed by HA particles when the coating time is less than 15 minutes. It was demonstrated that the heat-treated HA was well-crystallized and this enhanced the cell attachment of the anodized Ti surface.

  9. Microstructure and properties of SiC-coated carbon fibers prepared by radio frequency magnetron sputtering

    Science.gov (United States)

    Cheng, Yong; Huang, Xiaozhong; Du, Zuojuan; Xiao, Jianrong; Zhou, Shan; Wei, Yongshan

    2016-04-01

    SiC-coated carbon fibers are prepared at room temperature with different radio-frequency magnetron sputtering powers. Results show that the coated carbon fibers have uniform, continuous, and flawless surfaces. The mean strengths of the coated carbon fibers with different sputtering powers are not influenced by other factors. Filament strength of SiC-coated carbon fibers increases by approximately 2% compared with that of uncoated carbon fibers at a sputtering power of coated fibers increase by 9.3% and 12% at sputtering powers of 250 and 300 W, respectively. However, the mean strength of the SiC-coated carbon fibers decreased by 8% at a sputtering power of 400 W.

  10. Ionic conductivity and thermal stability of magnetron-sputtered nanocrystalline yttria-stabilized zirconia

    DEFF Research Database (Denmark)

    Sillassen, M.; Eklund, P.; Sridharan, M.;

    2009-01-01

    Thermally stable, stoichiometric, cubic yttria-stabilized zirconia (YSZ) thin-film electrolytes have been synthesized by reactive pulsed dc magnetron sputtering from a Zr–Y (80/20 at. %) alloy target. Films deposited at floating potential had a texture. Single-line profile analysis of the 111 x.......5% at bias voltages of −175 and −200 V with additional incorporation of argon. The films were thermally stable; very limited grain coarsening was observed up to an annealing temperature of 800 °C. Temperature-dependent impedance spectroscopy analysis of the YSZ films with Ag electrodes showed that the in......-plane ionic conductivity was within one order of magnitude higher in films deposited with substrate bias corresponding to a decrease in grain size compared to films deposited at floating potential. This suggests that there is a significant contribution to the ionic conductivity from grain boundaries...

  11. Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Vergara, L., E-mail: vergara@icmm.csic.e [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain); Galindo, R. Escobar [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain); Centro de Microanalisis de Materiales, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Martinez, R. [AIN, Centro de Ingenieria Avanzada de Superficies, 31191 Cordovilla, Pamplona (Spain); Sanchez, O. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain); Palacio, C. [Departamento de Fisica Aplicada, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Albella, J.M. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain)

    2011-03-31

    The development of mixed-oxide thin films allows obtaining materials with better properties than those of the different binary oxides, which makes them suitable for a great number of applications in different fields, such as tribology, optics or microelectronics. In this paper we investigate the deposition of mixed chromium and silicon oxides deposited by reactive magnetron sputtering with a view to use them as optical coatings with an adjustable refractive index. These films have been characterized by means of Rutherford backscattering spectrometry, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy, Fourier-transform infrared spectroscopy and spectroscopic ellipsometry so as to determine how the deposition conditions influence the characteristics of the material. We have found that the deposition parameter whose influence determines the properties of the films to a greater extent is the amount of oxygen in the reactive sputtering gas.

  12. Viable route towards large-area 2D MoS2 using magnetron sputtering

    Science.gov (United States)

    Samassekou, Hassana; Alkabsh, Asma; Wasala, Milinda; Eaton, Miller; Walber, Aaron; Walker, Andrew; Pitkänen, Olli; Kordas, Krisztian; Talapatra, Saikat; Jayasekera, Thushari; Mazumdar, Dipanjan

    2017-06-01

    Structural, interfacial, optical, and transport properties of large-area MoS2 ultra-thin films on BN-buffered silicon substrates fabricated using magnetron sputtering are investigated. A relatively simple growth strategy is demonstrated here that simultaneously promotes superior interfacial and bulk MoS2 properties. Few layers of MoS2 are established using x-ray reflectivity, diffraction, ellipsometry, and Raman spectroscopy measurements. Layer-specific modeling of optical constants show very good agreement with first-principles calculations. Conductivity measurements reveal that few-layer MoS2 films are more conducting than many-layer films. Photo-conductivity measurements reveal that the sputter deposited MoS2 films compare favorably with other large-area methods. Our work illustrates that sputtering is a viable route for large-area device applications using transition metal dichalcogenides.

  13. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Damon Rafieian

    2015-09-01

    Full Text Available We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx<2, obtained by sputtering at relatively low oxygen concentration, formed rutile upon annealing in air, whereas stoichiometric films formed anatase. This route therefore presents a formation route for rutile films via lower (<500 °C temperature pathways. The dynamics of the annealing process were followed by in situ ellipsometry, showing the optical properties transformation. The final crystal structures were identified by XRD. The anatase film obtained by this deposition method displayed high carriers mobility as measured by time-resolved microwave conductance. This also confirms the high photocatalytic activity of the anatase films.

  14. Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

    Institute of Scientific and Technical Information of China (English)

    TANG Ning; WANG JinLiang; XU HengXing; PENG HongYong; FAN Chao

    2009-01-01

    This study investigated the process parameter effects on the structural and optical properties of ZnO thin film using radio frequency(RF)magnetron sputtering on amorphous glass substrates.The process parameters included RF power and working pressure.Results show that RF power was increased to promote the crystalline quality and decrease ZnO thin film defects.However,when the working pressure was increased to 3 Pa the ZnO thin film crystalline quality became worse.At a 200 W RF power and 1 Pa working pressure,the ZnO thin film with an optical band gap energy of 3.225 eV was obtained.

  15. HT-LiCoO2 Thin Film Positive Electrodes Prepared by RF Magnetron Sputtering

    Science.gov (United States)

    Kumar, P. Jeevan; Babu, K. Jayanth; Hussain, O. M.

    2011-07-01

    Thin films of LiCoO2 prepared by RF magnetron sputtering on Si/SiO2/Ti/Au substrates are investigated microstructural and electrochemical properties. The as deposited film shown layered with (003) preferred orientation. After annealing at 923 K in presence of O2 ambient (5×10-2 mbar), HT hexagonal phase LiCoO2 is obtained for the films deposited at O2 to Ar ratio 1:9 and at substrate temperature 523 K. LiCoO2 deposit is unambiguously shown two Raman bands at 465 and 545 cm-1 confirming layered hexagonal structure. Also, studied the performance of the LiCoO2 as positive electrode in aqueous (Pt// LiCoO2) and non-aqueous (Li// LiCoO2) Li-ion rechargeable batteries.

  16. Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Moreira, Milena A. [Department of Solid State Electronics, Ångström Laboratory, Uppsala University, Box 534, SE-752 21 Uppsala, Sweden and School of Electrical and Computer Engineering, University of Campinas, CEP 13.083-852 Campinas-SP (Brazil); Törndahl, Tobias; Katardjiev, Ilia; Kubart, Tomas, E-mail: tomas.kubart@angstrom.uu.se [Department of Solid State Electronics, Ångström Laboratory, Uppsala University, Box 534, SE-752 21 Uppsala (Sweden)

    2015-03-15

    Aluminum nitride thin films were deposited by reactive high power impulse magnetron sputtering (HiPIMS) and pulsed direct-current on Si (100) and textured Mo substrates, where the same deposition conditions were used for both techniques. The films were characterized by x-ray diffraction and atomic force microscopy. The results show a pronounced improvement in the AlN crystalline texture for all films deposited by HiPIMS on Si. Already at room temperature, the HiPIMS films exhibited a strong preferred (002) orientation and at 400 °C, no contributions from other orientations were detected. Despite the low film thickness of only 200 nm, an ω-scan full width at half maximum value of 5.1° was achieved on Si. The results are attributed to the high ionization of sputtered material achieved in HiPIMS. On textured Mo, there was no significant difference between the deposition techniques.

  17. Photocatalytic Properties of Doped TiO2 Coatings Deposited Using Reactive Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Parnia Navabpour

    2017-01-01

    Full Text Available Mechanically robust photocatalytic titanium oxide coatings can be deposited using reactive magnetron sputtering. In this article, we investigate the effect of doping on the activity of reactively sputtered TiO2. Silver, copper and stainless steel targets were used to co-deposit the dopants. The films were characterised using XRD, SEM and EDX. Adhesion and mechanical properties were evaluated using scratch testing and nano-indentation, respectively, and confirmed that the coatings had excellent adhesion to the stainless steel substrate. All coatings showed superhydrophilicity under UV irradiation. A methylene blue degradation test was used to assess their photocatalytic activity and showed all coatings to be photoactive to varying degrees, dependent upon the dopant, its concentration and the resulting coating structure. The results demonstrated that copper doping at low concentrations resulted in the coatings with the highest photocatalytic activity under both UV and fluorescent light irradiation.

  18. In-situ investigations of magnetron sputtering processes with laboratory X-ray equipment

    Energy Technology Data Exchange (ETDEWEB)

    Ringpfeil, Clemens [Fachbereich C-Physik, Bergische Universitaet Wuppertal, Gaussstr. 20, D-42097 Wuppertal (Germany)]. E-mail: Clemens@physik.uni-wuppertal.de; Luetzenkirchen-Hecht, Dirk [Fachbereich C-Physik, Bergische Universitaet Wuppertal, Gaussstr. 20, D-42097 Wuppertal (Germany); Frahm, Ronald [Fachbereich C-Physik, Bergische Universitaet Wuppertal, Gaussstr. 20, D-42097 Wuppertal (Germany)

    2007-05-23

    An Fe-Al duplex film was prepared on a Si(111)-wafer by sputter deposition in a vacuum chamber with two integrated small magnetron sources. The chamber allows the in-situ investigation of such sputtering processes using grazing incidence X-ray reflectivity, X-ray scattering measurements and X-ray diffraction. We will present details of the new cell and present the first results obtained using reflectivity measurements of the Fe-Al thin films. Here we will focus on the detailed evaluation of the specular reflectivity data of the iron films only, which clearly indicates the presence of an iron oxide, the density and roughness of which were determined and their changes with the film thickness were discussed in the framework of thin film growth models.

  19. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Zhuo Shiyi; Xiong Yuying; Gu Min, E-mail: xiongyy@scnu.edu.c [Laboratory of Quantum Information Technology, School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510006 (China)

    2009-05-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn{sub 0.99}Cu{sub 0.01}O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1+. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  20. Anisotropy of the electron component in a cylindrical magnetron discharge. I. Theory of the multiterm analysis.

    Science.gov (United States)

    Porokhova, I A; Golubovskii, Yu B; Behnke, J F

    2005-06-01

    A general multiterm representation of the phase space electron distribution function in terms of spherical tensors is used to solve the Boltzmann kinetic equation in crossed electric and magnetic fields. The problem is formulated for an axisymmetric cylindrical magnetron discharge with the homogeneous magnetic field being directed axially and the electric field between the coaxial cathode and anode varying in radius only. A spherical harmonic representation of the velocity distribution function in Cartesian coordinates becomes especially cumbersome in the presence of the magnetic field. In contrast, the employment of a spherical tensor representation leads to a compact hierarchy of equations that accurately take into account the spatial inhomogeneities and anisotropy of the plasma in crossed fields. To describe the spatially inhomogeneous plasma the hierarchy of the kinetic equations is formulated in terms of the total energy and the radial coordinate. Appropriate boundary conditions at the electrodes for the tensor expansion coefficients are obtained.

  1. ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Loebl, H.P. [Philips Res. Labs., Aachen (Germany); Huppertz, M. [Philips Res. Labs., Aachen (Germany); Mergel, D. [University GH Essen, Fachbereich 7, Physik, D-45117, Essen (Germany)

    1996-07-01

    A reactive d.c. magnetron sputtering process with relatively high oxygen flow suitable for antireflective and antistatic (ARAS) coatings on display tubes is described. The sputtering conditions and their influence on optical, structural and electrical properties of indium tin oxide (ITO) films are discussed and compared with other ITO sputtering processes from a metallic target. Emphasis is placed on the relation between microstructure, defect structure and conductivity, and on the determination of the optimal process conditions for obtaining fine-grained films for optical applications that can withstand the 460 C heat treatment during tube assembly. As an example, a simple three-layer broadband ARAS coating is investigated, consisting of a transparent conductive ITO layer, a TiO{sub 2} layer and a SiO{sub 2} layer on top. (orig.)

  2. Nitrogen Contents on Tribological Properties of Magnetron Sputtered SiCN Coatings

    Institute of Scientific and Technical Information of China (English)

    TIETUN SUN; Y.Q. FU; J. WEI; H. J. DU

    2004-01-01

    Silicon carbonitride (SiCN) coatings were deposited on silicon and tungsten carbide substrates by co-sputtering silicon and carbon in argon and nitrogen mixture atmosphere using magnetron-sputtering system. The effect of the N2concentration, RF substrate bias voltage and target current on film deposition rate, roughness, adhesion, mechanical and tribological properties of coatings were investigated. The deposition rate was found to increase with the increasing nitrogen concentration. X-ray photoelectron spectroscopy analysis showed that high nitrogen concentration in the nitrogen-argon gas mixture enhanced the incorporation of C and N but reduced the incorporation of Si. SiCN coatings have good tribological properties at a N2 concentration of approximately 60%.

  3. Reactive DC magnetron sputtered zirconium nitride (ZrN) thin film and its characterization

    Science.gov (United States)

    Subramanian, B.; Ashok, K.; Sanjeeviraja, C.; Kuppusami, P.; Jayachandran, M.

    2008-05-01

    Zirconium nitride (ZrN) thin films were prepared by using reactive direct current (DC) magnetron sputtering onto different substrates. A good polycrystalline nature with face centered cubic structure was observed from X-ray Diffraction for ZrN thin films. The observed 'd' values from the X-ray Diffraction pattern were found to be in good agreement with the standard 'd' values (JCPDS-89-5269). An emission peak is observed at 587nm from Photoluminescence studies for the excitation at 430nm. The resistivity value (ρ) of 2.1798 (μΩ cm) was observed. ZrN has high wear resistance and low coefficient of friction. A less negative value of Ecorr and lower value of Icorr observed for ZrN / Mild Steel (MS) clearly confirm the better corrosion resistance than the bare substrate. Also the higher Rct value and lower Cdl value was observed for ZrN / MS from Nyquist - plot.

  4. Preparation and characterization of transparent conducting ZnO:W films by DC magnetron sputtering*

    Institute of Scientific and Technical Information of China (English)

    Zhang Huafu; Yang Shugang; Liu Hanfa; Yuan Changkun

    2011-01-01

    Tungsten-doped zinc oxide (ZnO:W) films with low resistivity and high transmittance were successfully deposited on glass substrates by direct current magnetron sputtering at low temperature. The deposition pressure is varied from 12 to 21 Pa. The X-ray diffraction results show that all of the deposited films are polycrystalline and have a hexagonal structure with a preferred c-axis orientation. The crystallinity, morphologies and resistivity of ZnO:W films greatly depend on deposition pressure while the optical properties including optical transmittance,optical band gap as well as refractive index are not sensitive to deposition pressure. The deposited films with an electrical resistivity as low as 1.5 × 10-4 Ω·cm, sheet resistance of 6.8 Ω/□ and an average transmittance of 91.3% in the visible range were obtained at a deposition pressure of 21 Pa and sputtering power of 130 W.

  5. Surface oxidation of vanadium dioxide films prepared by radio frequency magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Wang Xue-Jin; Liang Chun-Jun; Guan Kang-Ping; Li De-Hua; Nie Yu-Xin; Zhu Shi-Oiu; Huang Feng; Zhang Wei-Wei; Cheng Zheng-Wei

    2008-01-01

    This paper reports that the thermochromic vanadium dioxide films were deposited on various transparent substrates by radio frequency magnetron sputtering,and then aged under circumstance for years.Samples were characterized with several different techniques such as x-ray diffraction,x-ray photoelectron spectroscopy,and Raman,when they were fresh from sputter chamber and aged after years,respectively,in order to determine their structure and composition.It finds that a small amount of sodium occurred on the surface of vanadium dioxide films,which was probably due to sodium ion diffusion from soda-lime glass when sputtering was performed at high substrate temperature.It also finds that aging for years significantly affected the noustoichiometry of vanadium dioxide films,thus inducing much change in Raman modes.

  6. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

    Science.gov (United States)

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-01-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

  7. The Influence of Hydrogen on the Properties of Zinc Sulfide Thin Films Deposited by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Hang Xu

    2014-01-01

    Full Text Available Zinc sulfide thin films have been deposited with hydrogen in Ar and Ar+H2 atmosphere by radio frequency magnetron sputtering. The thickness, structural properties, composition, surface morphology, and optical and electrical properties of the films have been investigated. Effect of hydrogen on the properties of the film was studied. The results showed that hydrogen leads to better crystallinity and larger crystallite size of ZnS polycrystalline films. The band gaps of the films in Ar+H2 are about 3.48 eV compared with 3.24 eV without hydrogen. It is also demonstrated that hydrogen can result in a better stoichiometric composition of the films.

  8. Composition of nanocomposites based on thin layers of tin on porous silicon formed by magnetron sputtering

    Science.gov (United States)

    Lenshin, A. S.; Kashkarov, V. M.; Domashevskaya, E. P.; Seredin, P. V.; Ryabtsev, S. V.; Bel'tyukov, A. N.; Gil'mutdinov, F. Z.

    2017-01-01

    Using scanning electron microscopy and X-ray photoelectron spectroscopy the features of morphology and peculiarities of the surface composition of nanocomposites made of thin tin layers by magnetron sputtering formed on porous silicon with pores size of 50-150 nm. Porous silicon was obtained on n-type conductivity crystalline silicon substrate. The obtained nanocomposites were found differ between themselves by the ratio of the main phases: tin dioxide, sub-oxide and metal tin in a dependence on the thickness of the deposited tin layer. Fraction of the oxidized tin in the phase composition of composites was reduced from the surface to the bulk of the sample. Moreover, it was determined that the deposition of tin nanolayers did not result in a considerable change of the phase composition of porous silicon substrate.

  9. Structural properties of RF-magnetron sputtered Cu{sub 2}O thin films

    Energy Technology Data Exchange (ETDEWEB)

    Azanza Ricardo, C.L.; D' Incau, M.; Leoni, M. [Department of Materials Engineering and Industrial Technologies, University of Trento, 38123 via Mesiano 77, Trento (Italy); Malerba, C. [ENEA, Casaccia Research Center, via Anguillarese 301, 00123 Roma (Italy); Department of Materials Engineering and Industrial Technologies, University of Trento, 38123 via Mesiano 77, Trento (Italy); Mittiga, A. [ENEA, Casaccia Research Center, via Anguillarese 301, 00123 Roma (Italy); Scardi, P., E-mail: Paolo.Scardi@unitn.it [Department of Materials Engineering and Industrial Technologies, University of Trento, 38123 via Mesiano 77, Trento (Italy)

    2011-10-31

    Cuprous oxide thin films were produced on soda-lime glass substrates using reactive RF-magnetron sputtering. The influence of deposition parameters and temperature on composition and structural properties of the single layers was extensively studied using X-ray diffraction. The control over microstructure and residual stresses is possible by changing reactive gas pressure and deposition temperature. Fiber textured Cu2O films showing a [100] preferred orientation and a fraction of untextured domains can be obtained: suitable modeling taking this microstructure into account shows the presence of a strong compressive stress decreasing with the temperature. Highly reproducible films can be obtained, whose microstructure is preserved when sputtering on tungsten and zinc oxide substrates.

  10. Operational limit of a planar DC magnetron cluster source due to target erosion

    Energy Technology Data Exchange (ETDEWEB)

    Rai, A. [University of Erlangen–Nuernberg, Institute of Science and Technology of Metals, Martensstrasse 5, D-91058 Erlangen (Germany); Mutzke, A. [Max-Planck-Institute of Plasmaphysics, EURATOM Association, D-17491 Greifswald (Germany); Bandelow, G., E-mail: gstoppa@ipp.mpg.de [Max-Planck-Institute of Plasmaphysics, EURATOM Association, D-17491 Greifswald (Germany); Schneider, R.; Ganeva, M. [Institute of Physics, Ernst-Moritz-Arndt-University Greifswald, Felix-Hausdorff-Str. 6, D-17489 Greifswald (Germany); Pipa, A.V. [Leibniz Institute for Plasma Science and Technology (INP Greifswald), Felix-Hausdorff-Str. 2, D-17489 Greifswald (Germany); Hippler, R. [Institute of Physics, Ernst-Moritz-Arndt-University Greifswald, Felix-Hausdorff-Str. 6, D-17489 Greifswald (Germany)

    2013-12-01

    The binary collision-based two dimensional SDTrimSP-2D model has been used to simulate the erosion process of a Cu target and its influence on the operational limit of a planar DC magnetron nanocluster source. The density of free metal atoms in the aggregation region influences the cluster formation and cluster intensity during the target lifetime. The density of the free metal atoms in the aggregation region can only be predicted by taking into account (i) the angular distribution of the sputtered flux from the primary target source and (ii) relative downwards shift of the primary source of sputtered atoms during the erosion process. It is shown that the flux of the sputtered atoms smoothly decreases with the target erosion.

  11. Photocatalytic degradation characteristic of amorphous TiO2-W thin films deposited by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    HUANG Jia-mu; LI Yue-xia; ZHAO Guo-dong; CAI Xiao-ping

    2006-01-01

    TiO2-W films were deposited on the slides by reactive magnetron sputtering. Properties of the films were analyzed via AFM,XRD,XPS,STS,UV-Vis and ellipse polarization apparatus. The results show that TiO2-W films are amorphous. The AFM map reveals that the surface of the film is tough and porous. The experiments of decomposing methylene blue indicate that the thickness threshold on these films is 141 nm,at which the rate of photodegradation is 90% in 2 h. And when the thickness is over 141 nm,the rate of photodegradation does not increase any more. This result is completely different from that of crystalloid TiO2 thin film.

  12. Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement

    Institute of Scientific and Technical Information of China (English)

    QI Xuelian; REN Chunsheng; MA Tengcai; WANG Younian

    2008-01-01

    Metallic copper(Cu) films were deposited on a Si (100) substrate by unbalanced magnetron sputtering enhanced by radio-frequency plasma and external magnetic field confine-ment. The morphology and structure of the films were examined by scanning electron microscopy (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD). The surface average rough-ness of the deposited Cu films was characterized by AFM data and resistivity was measured by a four-point probe. The results show that the Cu films deposited with radio-frequency discharge enhanced ionization and external magnetic field confinement have a smooth surface, low surface roughness and low resistivity. The reasons may be that the radio-frequency discharge and external magnetic field enhance the plasma density, which further improves the ion bombardment effect under the same bias voltage conditions. Ion bombardment can obviously influence the growth features and characteristics of the deposited Cu films.

  13. Direct current magnetron sputter-deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Hoon, Jian-Wei [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Chan, Kah-Yoong, E-mail: kychan@mmu.edu.my [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Krishnasamy, Jegenathan; Tou, Teck-Yong [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Knipp, Dietmar [School of Engineering and Science, Jacobs University Bremen, 28759 Bremen (Germany)

    2011-01-15

    Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 deg. C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.

  14. Particle visualization in high-power impulse magnetron sputtering. II. Absolute density dynamics

    Energy Technology Data Exchange (ETDEWEB)

    Britun, Nikolay, E-mail: nikolay.britun@umons.ac.be; Palmucci, Maria; Konstantinidis, Stephanos [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Snyders, Rony [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Materia Nova Research Center, Parc Initialis, B-7000 Mons (Belgium)

    2015-04-28

    Time-resolved characterization of an Ar-Ti high-power impulse magnetron sputtering discharge has been performed. The present, second, paper of the study is related to the discharge characterization in terms of the absolute density of species using resonant absorption spectroscopy. The results on the time-resolved density evolution of the neutral and singly-ionized Ti ground state atoms as well as the metastable Ti and Ar atoms during the discharge on- and off-time are presented. Among the others, the questions related to the inversion of population of the Ti energy sublevels, as well as to re-normalization of the two-dimensional density maps in terms of the absolute density of species, are stressed.

  15. Particle visualization in high-power impulse magnetron sputtering. I. 2D density mapping

    Energy Technology Data Exchange (ETDEWEB)

    Britun, Nikolay, E-mail: nikolay.britun@umons.ac.be; Palmucci, Maria; Konstantinidis, Stephanos [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Snyders, Rony [Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, B-7000 Mons (Belgium); Materia Nova Research Center, Parc Initialis, B-7000 Mons (Belgium)

    2015-04-28

    Time-resolved characterization of an Ar-Ti high-power impulse magnetron sputtering discharge has been performed. This paper deals with two-dimensional density mapping in the discharge volume obtained by laser-induced fluorescence imaging. The time-resolved density evolution of Ti neutrals, singly ionized Ti atoms (Ti{sup +}), and Ar metastable atoms (Ar{sup met}) in the area above the sputtered cathode is mapped for the first time in this type of discharges. The energetic characteristics of the discharge species are additionally studied by Doppler-shift laser-induced fluorescence imaging. The questions related to the propagation of both the neutral and ionized discharge particles, as well as to their spatial density distributions, are discussed.

  16. Surface and Electrical Properties of NiCr Thin Films Prepared by DC Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHOU Jicheng; TIAN Li; YAN Jianwu

    2008-01-01

    Several batches of NiCr alloy thin films with different thickness were prepared in a multi-targets magnetron sputtering apparatus by changing sputtering time while keeping sputtering target power of Ni and Cr fixed. Then the as-deposited films were characterized by energy-dispersive X-Ray spectrometer (EDX),Atomic Force Microscope (AFM) and four-point probe (FPP) to measure surface grain size, roughness and sheet resistance. The film thickness was measured by Alpha-Step IQ Profilers. The thickness dependence of surface roughness, lateral grain size and resistivity was also studied. The experimental results show that the grain size increases with film thickness and the surface roughness reaches the order of nanometer at all film thickness. The as-deposited film resistivity decreases with film thickness.

  17. Synthesis and characterization of DC magnetron sputtered nano structured molybdenum thin films

    Science.gov (United States)

    Rondiya, S. R.; Rokade, A. V.; Jadhavar, A. A.; Pandharkar, S. M.; Kulkarni, R. R.; Karpe, S. D.; Diwate, K. D.; Jadkar, S. R.

    2016-04-01

    Molybdenum (Mo) thin films were deposited on corning glass (#7059) substrates using DC magnetron sputtering system. The effect of substrate temperature on the structural, morphology and topological properties have been investigated. Films were characterized by variety of techniques such as low angle x-ray diffraction (low angle XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM). The low angle XRD analysis revealed that the synthesized Mo films are nanocrystalline having cubic crystal structure with (110) preferential orientation. The microstructure of the deposited Mo thin films observed with FE-SEM images indicated that films are homogeneous and uniform with randomly oriented leaf shape morphology. The AFM analysis shows that with increase in substrate temperature the rms roughness of Mo films increases. The obtained results suggest that the synthesized nanostructured Mo thin films have potential application as a back contact material for high efficiency solar cells like CdTe, CIGS, CZTS etc.

  18. Optical properties and structures of silver thin films deposited by magnetron sputtering with different thicknesses

    Institute of Scientific and Technical Information of China (English)

    Xilian Sun; Ruijin Hong; Haihong Hou; Zhengxiu Fan; Jianda Shao

    2006-01-01

    A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness.Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.

  19. Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHANG Yi-chen; SUN Shao-ni; ZHOU Yi; MA Sheng-ge; BA De-chun

    2006-01-01

    Diamond-like carbon (DLC) films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film's performance were studied. The experimental results show that the film's surface roughness, the hardness and the Young's modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young's modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young's modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.

  20. High-rate deposition of silicon films in a magnetron discharge with liquid target

    Science.gov (United States)

    Tumarkin, A.; Zibrov, M.; Khodachenko, G.; Tumarkina, D.

    2016-10-01

    Silicon coatings have been deposited on substrates made of low-carbon and high- carbon steels and tungsten in a magnetron discharge with liquid target at substrate bias voltages ranging from +100 V to -600 V. The structure of obtained coatings was examined by a scanning electron microscopy. The strong influence of substrate bias voltage on the coating structure was observed. The corrosion resistance of coated steel samples was examined in concentrated sulphuric, hydrochloric and nitric acids and their solutions. The resistance of coated tungsten samples against high-temperature oxidation was examined by their exposure to O2 gas at a pressure of 0.2 Pa and a temperature of 1073 K. The coatings deposited under bias voltages of+100 V and -600 V had dense structures and showed the best protective properties among all deposited coatings.

  1. Synthesis of ReN3 Thin Films by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    G. Soto

    2014-01-01

    Full Text Available In this work ReNx films were prepared by reactive magnetron sputtering at room temperature and deposited on a silicon wafer. It was found that the diffractograms of the nitrogen-rich rhenium film are consistent with those produced by high-pressure high-temperature methods, under the assumption that the film is oriented on the substrate. Using density functional calculations it was found that the composition of this compound could be ReN3, instead of ReN2, as stated on previous works. The ReN3 compound fits in the Ama2 (40 orthorhombic space group, and due to the existence of N3 anions between Re layers it should be categorized as an azide. The material is exceptionally brittle and inherently unstable under indentation testing.

  2. Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Ti-containing carbon films were deposited by using magnetron sputtering deposition. The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; C1s peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp2 and sp3, respectively, and sp2 is superior to sp3. This Ti-containing film with dominating sp2 bonds is nanocomposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.

  3. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Zhuo Shiyi; Xiong Yuying; Gu Min

    2009-01-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn0.99Cu0.01 O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  4. The Gibbs Thomson effect in magnetron-sputtered austenitic stainless steel films

    Science.gov (United States)

    Cusenza, S.; Borchers, C.; Carpene, E.; Schaaf, P.

    2007-03-01

    Magnetron sputtering of austenitic stainless steel AISI 316, which has a face-centred cubic structure (γ), leads to films exhibiting a body-centred cubic (α) structure or a mixture of α- and γ-phases. The microstructure of the deposited films was studied by Mössbauer spectroscopy, x-ray diffraction and transmission electron microscopy. With increasing deposition temperature a phase transformation from α- to γ-phase was observed in these films. Instantaneous recording of the electromotive force shows that nickel content and deposition temperature are crucial factors for phase stability and phase formation. In room temperature deposited stainless steel films, the phase transformation after vacuum annealing can be described by the Johnson-Mehl-Avrami kinetic model. These phase transformations in stainless steel films during annealing can be explained with the Gibbs-Thomson effect, where the grain boundary energy raises the Gibbs free energy.

  5. The Gibbs-Thomson effect in magnetron-sputtered austenitic stainless steel films

    Energy Technology Data Exchange (ETDEWEB)

    Cusenza, S [Universitaet Goettingen, II Physikalisches Institut, Friedrich-Hund-Platz 1, 37077 Goettingen (Germany); Borchers, C [Universitaet Goettingen, II Physikalisches Institut, Friedrich-Hund-Platz 1, 37077 Goettingen (Germany); Carpene, E [Politecnico di Milano, Dipartimento di Fisica, Piazza Leonardo da Vinci 32, 20133 Milan (Italy); Schaaf, P [Universitaet Goettingen, II Physikalisches Institut, Friedrich-Hund-Platz 1, 37077 Goettingen (Germany)

    2007-03-14

    Magnetron sputtering of austenitic stainless steel AISI 316, which has a face-centred cubic structure ({gamma}), leads to films exhibiting a body-centred cubic ({alpha}) structure or a mixture of {alpha}- and {gamma}-phases. The microstructure of the deposited films was studied by Moessbauer spectroscopy, x-ray diffraction and transmission electron microscopy. With increasing deposition temperature a phase transformation from {alpha}- to {gamma}-phase was observed in these films. Instantaneous recording of the electromotive force shows that nickel content and deposition temperature are crucial factors for phase stability and phase formation. In room temperature deposited stainless steel films, the phase transformation after vacuum annealing can be described by the Johnson-Mehl-Avrami kinetic model. These phase transformations in stainless steel films during annealing can be explained with the Gibbs-Thomson effect, where the grain boundary energy raises the Gibbs free energy.

  6. Compression and strong rarefaction in high power impulse magnetron sputtering discharges

    Energy Technology Data Exchange (ETDEWEB)

    Horwat, David; Anders, Andre

    2010-11-11

    Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.

  7. Effects of Annealing on TiN Thin Film Growth by DC Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Azadeh Jafari

    2014-07-01

    Full Text Available We have reviewed the deposition of titanium nitride (TiN thin films on stainless steel substrates by a DC magnetron sputtering method and annealing at different annealing temperatures of 500, 600, and 700°C for 120 min in nitrogen/argon atmospheres. Effects of annealing temperatures on the structural and the optical properties of TiN films were investigated using X-ray diffraction (XRD, atomic force microscope (AFM, field emission scanning electron microscopy (FESEM, and UV-VIS spectrophotometer. Our experimental studies reveal that the annealing temperature appreciably affected the structures, crystallite sizes, and reflection of the films. By increasing the annealing temperature to 700°C crystallinity and reflection of the film increase. These results suggest that annealed TiN films can be good candidate for tokamak first wall due to their structural and optical properties.

  8. Characteristics of W Doped Nanocrystalline Carbon Films Prepared by Unbalanced Magnetron Sputtering.

    Science.gov (United States)

    Park, Yong Seob; Park, Chul Min; Kim, Nam-Hoon; Kim, Jae-Moon

    2016-05-01

    Nanocrystalline tungsten doped carbon (WC) films were prepared by unbalanced magnetron sputtering. Tungsten was used as the doping material in carbon thin films with the aim of application as a contact strip in an electric railway. The structural, physical, and electrical properties of the fabricated WC films with various DC bias voltages were investigated. The films had a uniform and smooth surface. Hardness and frication characteristics of the films were improved, and the resistivity and sheet resistance decreased with increasing negative DC bias voltage. These results are associated with the nanocrystalline WC phase and sp(2) clusters in carbon networks increased by ion bombardment enhanced with increasing DC bias voltage. Consequently, the increase of sp(2) clusters containing WC nanocrystalline in the carbon films is attributed to the improvement in the physical and electrical properties.

  9. Structural and optical properties of CdO thin films deposited by RF magnetron sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, G. Anil, E-mail: anilhcu@gmail.com; Reddy, M. V. Ramana, E-mail: anilhcu@gmail.com [Department of Physics, Osmania University, Hyderabad-500007 (India); Reddy, Katta Narasimha, E-mail: anilhcu@gmail.com [Department of Physics, Mahatma Gandhi University, Nalgonda-508003 (India)

    2014-04-24

    Cadmium oxide (CdO) thin films were deposited on glass substrate by r.f. magnetron sputtering technique using a high purity (99.99%) Cd target of 2-inch diameter and 3 mm thickness in an Argon and oxygen mixed atmosphere with sputtering power of 50W and sputtering pressure of 2×10{sup −2} mbar. The prepared films were characterized by X-ray diffraction (XRD), optical spectroscopy and scanning electron microscopy (SEM). The XRD analysis reveals that the films were polycrystalline with cubic structure. The visible range transmittance was found to be over 70%. The optical band gap increased from 2.7 eV to2.84 eV with decrease of film thickness.

  10. A new solid state extractor pulser for the FNAL magnetron ion source

    Energy Technology Data Exchange (ETDEWEB)

    Bollinger, D. S. [Fermilab; Lackey, J. [Fermilab; Larson, J. [Fermilab; Triplett, K. [Fermilab

    2015-10-05

    A new solid state extractor pulser has been installed on the Fermi National Accelerator Laboratory (FNAL) magnetron ion source, replacing a vacuum tube style pulser that was used for over 40 years. The required ion source extraction voltage is 35 kV for injection into the radio frequency quadrupole. At this voltage, the old pulser had a rise time of over 150 μs due to the current limit of the vacuum tube. The new solid state pulsers are capable of 50 kV, 100 A peak current pulses and have a rise time of 9 μs when installed in the operational system. This paper will discuss the pulser design and operational experience to date.

  11. Phase Structural Characteristics of ZrV2 Thin Film Prepared by Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XU Shi-Lin; SHI Li-Qun

    2005-01-01

    @@ The thin film metal hydride has become an emerging field of research in metal hydride batteries for its good mechanical and hydrogenation properties. ZrV2 thin films have been prepared using a dc magnetron sputtering method, and the phase structure is investigated. Only amorphous or crystalline Zr and V mixture phases are achieved when substrates are heated during either to 400℃ or to 550 ℃. The annealing causes segregation of Zr and V in the film induced by strain-driven diffusion and interdiffusion between substrate Mo and film elements at high temperature, which results in the formation of mixture phases of C14, C15, Zr and V, but the content of C15 phase is not higher compared with that in the bulk material.

  12. A new solid state extractor pulser for the FNAL magnetron ion source

    Energy Technology Data Exchange (ETDEWEB)

    Bollinger, D. S., E-mail: bollinger@fnal.gov; Lackey, J.; Larson, J.; Triplett, K. [Proton Source Department, Fermi National Accelerator Laboratory, Batavia, Illinois 60510 (United States)

    2016-02-15

    A new solid state extractor pulser has been installed on the Fermi National Accelerator Laboratory (FNAL) magnetron ion source, replacing a vacuum tube style pulser that was used for over 40 years. The required ion source extraction voltage is 35 kV for injection into the radio frequency quadrupole. At this voltage, the old pulser had a rise time of over 150 μs due to the current limit of the vacuum tube. The new solid state pulsers are capable of 50 kV, 100 A peak current pulses and have a rise time of 9 μs when installed in the operational system. This paper will discuss the pulser design and operational experience to date.

  13. Tribological behavior of magnetron sputtering CrMoN/MoS2 composite coatings

    Institute of Scientific and Technical Information of China (English)

    Yuelan DI; Zhihai CAI; Ping ZHANG; Zhen YANG; Qi LI; Wei SHEN

    2012-01-01

    CrMoN composite coatings were deposited on the surface of the stainless steel by magnetron sputtering,then were treated by low temperature ion sulfuration.FESEM equipped with EDX was adopted to analyze the morphologies and compositions of the surface,cross-section and worn scar of the sulfuration layer.The valence states of the film surface were detected by XPS.The nano-hardness and nano-modulus of the layer were measured by a nano tester.The results of the friction and wear show that the CrMoN/MoS2 composite coating is a kind of ideal solid lubrication layer and possess an excellent antifriction and wear-resistance.

  14. Dual massive gravity

    Energy Technology Data Exchange (ETDEWEB)

    Morand, Kevin, E-mail: Kevin.Morand@lmpt.univ-tours.fr [Laboratoire de Mathematiques et Physique Theorique, Universite Francois-Rabelais Tours, Federation Denis Poisson - CNRS, Parc de Grandmont, 37200 Tours (France); Solodukhin, Sergey N., E-mail: Sergey.Solodukhin@lmpt.univ-tours.fr [Laboratoire de Mathematiques et Physique Theorique, Universite Francois-Rabelais Tours, Federation Denis Poisson - CNRS, Parc de Grandmont, 37200 Tours (France)

    2012-08-29

    The linearized massive gravity in three dimensions, over any maximally symmetric background, is known to be presented in a self-dual form as a first order equation which encodes not only the massive Klein-Gordon type field equation but also the supplementary transverse-traceless conditions. We generalize this construction to higher dimensions. The appropriate dual description in d dimensions, additionally to a (non-symmetric) tensor field h{sub {mu}{nu}}, involves an extra rank-(d-1) field equivalently represented by the torsion rank-3 tensor. The symmetry condition for h{sub {mu}{nu}} arises on-shell as a consequence of the field equations. The action principle of the dual theory is formulated. The focus has been made on four dimensions. Solving one of the fields in terms of the other and putting back in the action one obtains two other equivalent formulations of the theory in which the action is quadratic in derivatives. In one of these representations the theory is formulated entirely in terms of a rank-2 non-symmetric tensor h{sub {mu}{nu}}. This quadratic theory is not identical to the Fierz-Pauli theory and contains the coupling between the symmetric and antisymmetric parts of h{sub {mu}{nu}}. Nevertheless, the only singularity in the propagator is the same as in the Fierz-Pauli theory so that only the massive spin-2 particle is propagating. In the other representation, the theory is formulated in terms of the torsion rank-3 tensor only. We analyze the conditions which follow from the field equations and show that they restrict to 5 degrees of freedom thus producing an alternative description to the massive spin-2 particle. A generalization to higher dimensions is suggested.

  15. Enhancement of bioactivity on medical polymer surface using high power impulse magnetron sputtered titanium dioxide film.

    Science.gov (United States)

    Yang, Yi-Ju; Tsou, Hsi-Kai; Chen, Ying-Hung; Chung, Chi-Jen; He, Ju-Liang

    2015-12-01

    This study utilizes a novel technique, high power impulse magnetron sputtering (HIPIMS), which provides a higher ionization rate and ion bombardment energy than direct current magnetron sputtering (DCMS), to deposit high osteoblast compatible titanium dioxide (TiO2) coatings with anatase (A-TiO2) and rutile (R-TiO2) phases onto the biomedical polyetheretherketone (PEEK) polymer substrates at low temperature. The adhesions of TiO2 coatings that were fabricated using HIPIMS and DCMS were compared. The in vitro biocompatibility of these coatings was confirmed. The results reveal that HIPIMS can be used to prepare crystallinic columnar A-TiO2 and R-TiO2 coatings on PEEK substrate if the ratio of oxygen to argon is properly controlled. According to a tape adhesion test, the HIPIMS-TiO2 coatings had an adhesion grade of 5B even after they were immersed in simulated body fluid (SBF) environments for 28days. Scratch tests proved that HIPIMS-TiO2 coatings undergo cohesive failure. These results demonstrate that the adhesive force between HIPIMS-TiO2 coating/PEEK is stronger than that between DCMS-TiO2 coating/PEEK. After a long period (28days) of immersion in SBF, a bone-like crystallinic hydroxyapatite layer with a corresponding Ca/P stoichiometry was formed on both HIPIMS-TiO2. The osteoblast compatibility of HIPIMS-TiO2 exceeded that of the bare PEEK substrate. It is also noticeable that the R-TiO2 performed better in vitro than the A-TiO2 due to the formation of many negatively charged hydroxyl groups (-OH(-)) groups on R-TiO2 (110) surface. In summary, the HIPIMS-TiO2 coatings satisfied the requirements for osseointegration, suggesting the possibility of using HIPIMS to modify the PEEK surface with TiO2 for spinal implants.

  16. Mechanical, tribological and corrosion performance of WBN composite films deposited by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Yu, Lihua; Zhao, Hongjian; Xu, Junhua, E-mail: jhxu@just.edu.cn

    2014-10-01

    Highlights: • WBN composite films were deposited by reactive magnetron sputtering. • The WBN film which exhibited the highest hardness had best wear resistance at room and elevated temperature. • The corrosion resistance of the substrate which coated with W{sub 2}N films or WBN films was superior to the uncoated substrate. • The corrosion resistance of the substrate which coated with W{sub 2}N films was improved slightly by doping some boron content and the corrosion mechanism was discussed in the view of structure. - Abstract: WBN composite films with various boron contents ranging from 25.1 at.% to 46.5 at.% were deposited by a multi-target magnetron sputtering system. The microstructure, mechanical, tribological and corrosion behavior of films were studied using XRD, SEM, FTIR, HRTEM, nano-indentation, Ball-on-disc dry sliding wear tester, Bruker 3D Profiler and compared to W{sub 2}N. All the films exhibited face-centred cubic (fcc) structure W{sub 2}N; bcc α-W phases appeared as the B content was 25.1 at.% and amorphous BN appeared as the B content was 31.9 at.%. The hardness and compressive stress of WBN films first increased and then decreased with increasing the B content. As the B content was 38.1 at.%, they reached the maximum values of 36.1 GPa and 2.6 GPa, respectively. The best wear resistance at room and elevated temperature was found for the film which was shown to exhibit the highest hardness and compressive stress. The corrosion resistance of the substrate which coated with W{sub 2}N films or WBN films was superior to the uncoated substrate. The corrosion resistance of the substrate which coated with W{sub 2}N films was improved slightly by doping some boron content.

  17. Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Jinlong, E-mail: golden_dragon@126.com [State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050 (China); School of Science, Lanzhou University of Technology, Lanzhou 730050 (China); Wang, Yubao; Du, Jinfang; Yang, Hua [State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050 (China); Hao, Junying, E-mail: jyhao@licp.cas.cn [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China)

    2016-08-30

    Highlights: • The a-C:H:Si films were deposited by magnetron sputtering Si target in argon and methane gas mixture atmosphere. • The growth of a-C:H:Si films is classified into three modes with increasing of methane flow rate. • The a-C:H:Si films at moderate methane flow rate exhibit low stress, high hardness and superior tribological properties. - Abstract: The silicon doped hydrogenated amorphous carbon (a-C:H:Si) films were prepared on silicon substrates by middle-frequency magnetron sputtering silicon target in an argon and methane gas mixture atmosphere. The deposition rate, chemical composition, structure, surface properties, stress, hardness and tribological properties in the ambient air of the films were systemically investigated using X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), atomic force microscopy (AFM), nanoindentation and tribological tester. The results show that doped silicon content in the films is controlled in the wide range from 39.7 at.% to 0.2 at.% by various methane gas flow rate, and methane flow rate affects not only the silicon content but also its chemical bonding structure in the films due to the transformation of sputtering modes. Meanwhile, the sp{sup 3} carbon component in the films linearly increases with increasing of methane flow rate. The film deposited at moderate methane flow rate of 40–60 sccm exhibits the very smooth surface (RMS roughness 0.4 nm), low stress (0.42 GPa), high hardness (21.1 GPa), as well as low friction coefficient (0.038) and wear rate (1.6 × 10{sup −7} mm{sup 3}/Nm). The superior tribological performance of the films could be attributed to the formation and integral covering of the transfer materials on the sliding surface and their high hardness.

  18. Natural fiber composites with EMI shielding function fabricated using VARTM and Cu film magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Xia, Changlei [Department of Mechanical and Energy Engineering, University of North Texas, Denton, TX 76203 (United States); Ren, Han [Department of Electrical Engineering, University of North Texas, Denton, TX 76203 (United States); Shi, Sheldon Q., E-mail: Sheldon.Shi@unt.edu [Department of Mechanical and Energy Engineering, University of North Texas, Denton, TX 76203 (United States); Zhang, Hualiang [Department of Electrical Engineering, University of North Texas, Denton, TX 76203 (United States); Cheng, Jiangtao [Department of Mechanical Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA 24061 (United States); Cai, Liping [Department of Mechanical and Energy Engineering, University of North Texas, Denton, TX 76203 (United States); Chen, Kathleen; Tan, Hwa-Shen [Texas Academy of Mathematics and Science, University of North Texas, Denton, TX 76203 (United States)

    2016-01-30

    Graphical abstract: - Highlights: • Natural-fiber-reinforced composites with electromagnetic shielding were fabricated. • Copper magnetron sputtering was applied on the composite surfaces. • The highest electromagnetic interference shielding effective reached 48.3 dB. • The water contact angle changed from 49.6° to 129.5° after 0.5-h sputtering. - Abstract: To fabricate kenaf fiber composites with electromagnetic interference (EMI) shielding function, the technique of vacuum-assisted resin transfer molding (VARTM) and Cu film magnetron sputtering were employed. The EMI shielding effectiveness (SE) and composite surface characteristics were examined with PNA Network Analyzer, Quanta 200 environmental scanning electron microscope and OCA20 contact angle meter. After being Cu-sputter coated for 0.5 h, 1 h, 2 h, and 3 h, the EMI SE values were increased to be 23.8 dB, 32.5 dB, 43.3 dB, and 48.3 dB, which denoted 99.5799%, 99.9437%, 99.9953%, or 99.9985% incident signal was blocked, respectively. The SEM observations revealed that the smoother surface of the composites was obtained by longer time sputtering, resulting in the SE improvement. The contact angle increased from 49.6° to 129.5° after 0.5 h sputtering, which indicated that the coated Cu film dramatically improved the hydrophobic property of composite. When the coating time increased to 3 h, the contact angle decreased to 51.0° because the composite surface roughness decreased with the increase in coating time.

  19. TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures

    Energy Technology Data Exchange (ETDEWEB)

    Kadlec, S.; Musil, J. (Ceskoslovenska Akademie Ved, Prague (Czechoslovakia). Fyzikalni Ustav); Valvoda, V. (Karlova Univ., Prague (Czechoslovakia). Fakulta Matematicko-Fyzikalni); Muenz, W.-D.; Petersein, H.; Schroeder, J. (Leybold A.G., Hanau (Germany, F.R.))

    1990-01-01

    TiN films were produced by reactive magnetron sputtering at a discharge pressure of 0.09 Pa on substrates placed 200 mm away from the magnetron target, using a sputtering system with enhanced ionization by means of multipolar magnetic confinement. The effects on film properties are reported for two ranges of values: an external substrate bias U{sub s} of from -35 to -150 V, and a floating potential U{sub fl} of from -24 to -45 V. All films show a dense microstructure, a smooth surface and shiny golden color. The microhardness HV is between 2000 and 2600 kg mm{sup -1}, a high critical load of up to L{sub c} = 58 N in scratch tests and the coefficient of friction against a cemented carbide counter ball is between 0.12 and 0.22. The color co-ordinated L{sup *}, A{sup *} and B{sup *} depend on the bias voltage. The brightness L{sup *} reaches 78 CIELAB units. The properties of films prepared at U{sub s} between -60 and -150 V compare well to those of ion-plated films. The films prepared at U{sub s} < 60 V, or at any of the values for U{sub fl}, exhibit comparatively low compressive microstresses down to 2.2 GPa and low microstrain down to 3.5 x 10{sup -3}. These films show single (111), (200) or (220) textures, or a mixed (200) + (111) texture, depending on the U value at which they were prepared. (author).

  20. Coating of titanium implants with boron nitride by RF-magnetron sputtering

    Indian Academy of Sciences (India)

    CEREN GÖKMENOGLU; NURDAN ÖZMERIÇ; GAYE ÇAKAL; NIHAN DÖKMETAS; CANSU ERGENE; BILGIN KAFTANOGLU

    2016-09-01

    Surface modification is necessary for titanium implants since it is unable to induce bone apposition. The beneficial effects of boron on bone formation, composition and physical properties make it suitable as a coating material. In the present study, surface properties of boron nitride (BN) coating on titanium implants were evaluated. Twenty-four implants and 12 abutments were coated with BN by RF-magnetron sputtering system. ATR–FTIR measurements were conducted to assess surface chemistry and morphology of BN-coated implants. Adhesion tests were performed by CSM nanoscratch test device to determine adhesion of BN to titanium surface. Surface profilometry and atomic force microscopy (AFM) was used to evaluate surface roughness.Mean roughness values were calculated. Contact angle measurements were done for evaluation of wettability. Surface characterization of coated implants was repeated after RF power of the system was increased and voltage values were changed to evaluate if these settings have an impact on coating quality. Three different voltage values were used for this purpose. Hexagonal-BN was determined in FTIR spectra. RF-coating technique provided adequate adherence of BN coatings to the titanium surface. A uniform BN coating layer was formed on the titanium implants with no deformation on the titanium surface. Similar roughness values were maintained after BN coating procedure. Before coating, the contact angles of the implants were in between 63$^{\\circ}$ and 79$^{\\circ}$, whereas BN coated implants’ contact angles ranged between 46$^{\\circ}$ and 67$^{\\circ}$. BN-coated implant surfaces still have hydrophilic characteristics. The change in voltage values seemed to affect the surface coating characteristics. Especially, the phase of the BN coating was different when different voltages were used. According to our results, BN coating can be sufficiently performed on pretreated implant surfaces and the characteristicsof BN coated surfaces can be

  1. A Magnetron Sputter Deposition System for the Development of Multilayer X-Ray Optics

    Science.gov (United States)

    Broadway, David; Ramsey, Brian; Gubarev, Mikhail

    2014-01-01

    The proposal objective is to establish the capability to deposit multilayer structures for x-ray, neutron, and EUV optic applications through the development of a magnetron sputtering deposition system. A specific goal of this endeavor is to combine multilayer deposition technology with the replication process in order to enhance the MSFC's position as a world leader in the design of innovative X-ray instrumentation through the development of full shell replicated multilayer optics. The development of multilayer structures is absolutely necessary in order to advance the field of X-ray astronomy by pushing the limit for observing the universe to ever increasing photon energies (i. e. up to 200 keV or higher); well beyond Chandra (approx. 10 keV) and NuStar's (approx. 75 keV) capability. The addition of multilayer technology would significantly enhance the X-ray optics capability at MSFC and allow NASA to maintain its world leadership position in the development, fabrication and design of innovative X-ray instrumentation which would be the first of its kind by combining multilayer technology with the mirror replication process. This marriage of these technologies would allow astronomers to see the universe in a new light by pushing to higher energies that are out of reach with today's instruments.To this aim, a magnetron vacum sputter deposition system for the deposition of novel multilayer thin film X-ray optics is proposed. A significant secondary use of the vacuum deposition system includes the capability to fabricate multilayers for applications in the field of EUV optics for solar physics, neutron optics, and X-ray optics for a broad range of applications including medical imaging.

  2. Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films

    Science.gov (United States)

    Hellgren, Niklas; Macák, Karol; Broitman, Esteban; Johansson, Mats P.; Hultman, Lars; Sundgren, Jan-Eric

    2000-07-01

    Carbon nitride CNx thin films were grown by unbalanced dc magnetron sputtering from a graphite target in a pure N2 discharge, and with the substrate temperature Ts kept between 100 and 550 °C. A solenoid coil positioned in the vicinity of the substrate was used to support the magnetic field of the magnetron, so that the plasma could be increased near the substrate. By varying the coil current and gas pressure, the energy distribution and fluxes of N2+ ions and C neutrals could be varied independently of each other over a wide range. An array of Langmuir probes in the substrate position was used to monitor the radial ion flux distribution over the 75-mm-diam substrate, while the flux and energy distribution of neutrals was estimated through Monte Carlo simulations. The structure, surface roughness, and mechanical response of the films are found to be strongly dependent on the substrate temperature, and the fluxes and energies of the deposited particles. By controlling the process parameters, the film structure can thus be selected to be amorphous, graphite-like or fullerene-like. When depositing at 3 mTorr N2 pressure, with Ts>200 °C, a transition from a disordered graphite-like to a hard and elastic fullerene-like structure occurred when the ion flux was increased above ˜0.5-1.0 mA/cm2. The nitrogen-to-carbon concentration ratio in the films ranged from ˜0.1 to 0.65, depending on substrate temperature and gas pressure. The nitrogen film concentration did, however, not change when varying the nitrogen ion-to-carbon atom flux ratios from ˜1 to 20.

  3. Structure dependent resistivity and dielectric characteristics of tantalum oxynitride thin films produced by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Cristea, D., E-mail: daniel.cristea@unitbv.ro [Department of Materials Science, Transilvania University, 500036 Brasov (Romania); Crisan, A. [Department of Materials Science, Transilvania University, 500036 Brasov (Romania); Cretu, N. [Electrical Engineering and Applied Physics Department, Transilvania University, 500036 Brasov (Romania); Borges, J. [Centro de Física, Universidade do Minho, Campus de Gualtar, 4710 - 057 Braga (Portugal); Instituto Pedro Nunes, Laboratório de Ensaios, Desgaste e Materiais, Rua Pedro Nunes, 3030-199 Coimbra (Portugal); SEG-CEMUC, Mechanical Engineering Department, University of Coimbra, 3030-788 Coimbra (Portugal); Lopes, C.; Cunha, L. [Centro de Física, Universidade do Minho, Campus de Gualtar, 4710 - 057 Braga (Portugal); Ion, V.; Dinescu, M. [National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, “Photonic Processing of Advanced Materials” Group, PO Box MG-16, RO 77125 Magurele-Bucharest (Romania); Barradas, N.P. [Centro de Ciências e Tecnologias Nucleares, Instituto Superior Técnico, Universidade de Lisboa, E.N. 10 ao km 139,7, 2695-066 Bobadela LRS (Portugal); Alves, E. [Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, E.N. 10 ao km 139,7, 2695-066 Bobadela LRS (Portugal); Apreutesei, M. [MATEIS Laboratory-INSA de Lyon, 21 Avenue Jean Capelle, 69621 Villeurbanne cedex (France); Université de Lyon, Institut des Nanotechnologies de Lyon INL-UMR5270, CNRS, Ecole Centrale de Lyon, Ecully F-69134 (France); Munteanu, D. [Department of Materials Science, Transilvania University, 500036 Brasov (Romania)

    2015-11-01

    Highlights: • Tantalum oxynitride thin films have been deposited by magnetron sputtering, in various configurations. • The rising of the reactive gases mixture flow has the consequence of a gradual increase in the non-metallic content in the films, which results in a 10 orders of magnitude resistivity domain. • The higher resistivity films exhibit dielectric constants up to 41 and quality factors up to 70. - Abstract: The main purpose of this work is to present and to interpret the change of electrical properties of Ta{sub x}N{sub y}O{sub z} thin films, produced by DC reactive magnetron sputtering. Some parameters were varied during deposition: the flow of the reactive gases mixture (N{sub 2} and O{sub 2}, with a constant concentration ratio of 17:3); the substrate voltage bias (grounded, −50 V or −100 V) and the substrate (glass, (1 0 0) Si or high speed steel). The obtained films exhibit significant differences. The variation of the deposition parameters induces variations of the composition, microstructure and morphology. These differences cause variation of the electrical resistivity essentially correlated with the composition and structural changes. The gradual decrease of the Ta concentration in the films induces amorphization and causes a raise of the resistivity. The dielectric characteristics of some of the high resistance Ta{sub x}N{sub y}O{sub z} films were obtained in the samples with a capacitor-like design (deposited onto high speed steel, with gold pads deposited on the dielectric Ta{sub x}N{sub y}O{sub z} films). Some of these films exhibited dielectric constant values higher than those reported for other tantalum based dielectric films.

  4. Towards a Dual Approach

    DEFF Research Database (Denmark)

    Holli, Anne Maria; Harder, Mette Marie Stæhr

    2016-01-01

    countries acknowledged as forerunners in gender equality, which also have ‘fairly strong’ parliamentary standing committees. The results show that both committees on gender equality can be regarded as ‘feminist’ in character and both interact with relevant civil society organisations. Their impact......Drawing on insights from state feminism and legislative studies on parliamentary committees, this article develops a dual approach for the comparative analysis of committees on gender equality. Empirically, it compares the standing committees on gender equality in Denmark and Finland, two Nordic...

  5. Dual cure photocatalyst systems

    Energy Technology Data Exchange (ETDEWEB)

    DeVoe, R.J.; Brown-Wensley, K.A.; Holmes, G.L.; Mathis, M.D.; McCormick, F.B.; Palazzotto, M.C.; Spurgeon, K.M. (Minnesota Mining and Mfg. Co., St. Paul, MN (USA). Corporate Research Labs.)

    1990-01-01

    A family of dual cure photocatalyst systems is being developed to be used in the solventless processing of organic coatings. The photocatalyst systems consist of organometallic compounds often in combination with other agents. Upon photolysis, the photocatalyst system generates a Lewis acid and a free radical. The Lewis acid can initiate the polymerization of epoxies or the addition of isocyanates and polyols to form polyurethanes while the free radical can initiate the polymerization of acrylates. The performance of the various photocatalyst systems will be compared on the basis of the physical properties of the cured compositions they produce. 17 figs.

  6. Robust dual-response optimization

    NARCIS (Netherlands)

    Yanikoglu, Ihsan; den Hertog, Dick; Kleijnen, J.P.C.

    2016-01-01

    This article presents a robust optimization reformulation of the dual-response problem developed in response surface methodology. The dual-response approach fits separate models for the mean and the variance and analyzes these two models in a mathematical optimization setting. We use metamodels esti

  7. Dual-Credit in Kentucky

    Science.gov (United States)

    Stephenson, Lisa G.

    2013-01-01

    Credit-based transition programs provide high school students with opportunities to jump start their college education. The Kentucky Community and Technical College System (KCTCS) offers college credit through dual-credit programs. While KCTCS dual-credit offerings have been successful in helping high school students start their college education…

  8. Dual-core Itanium Processor

    CERN Multimedia

    2006-01-01

    Intel’s first dual-core Itanium processor, code-named "Montecito" is a major release of Intel's Itanium 2 Processor Family, which implements the Intel Itanium architecture on a dual-core processor with two cores per die (integrated circuit). Itanium 2 is much more powerful than its predecessor. It has lower power consumption and thermal dissipation.

  9. Dual Card,Double Happiness

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    As Christmas Day and New Year Day draw near, why not treat yourself with a smart digital gizmo. Then, the Samsung Dual-card Cellphone is what you are longing for. Samsung B5712C, the first dual-card model released by Samsung,

  10. Asymmetry in Dual Language Practice

    Directory of Open Access Journals (Sweden)

    Audrey Amrein

    2000-01-01

    Full Text Available The capacity for dual-language programs to deliver specific benefits to students with different primary and secondary language skills continues to be debated. Individuals favoring dual language assert that as it relies upon a reciprocal approach, dual language students acquire dual language proficiency without the need for teachers to translate from one language to another. By utilizing and conserving the language skills that students bring, dual language students also gain cross-cultural understandings and an expanded opportunity to realize academic success in the future. Research that explores whether these programs meet the needs of monolingual and bilingual students is limited. The intent of this study is not to criticize dual language practice. Instead, it is to describe a newly implemented dual language immersion program that exists and operates in Phoenix, Arizona. In particular, this study examines the practices of dual language teachers at Leigh Elementary School and the challenges encountered as school personnel worked to provide students with different primary and secondary language skills increased opportunities to learn.

  11. Benefits of Dual Language Education

    Science.gov (United States)

    Wallstrum, Kiara

    2009-01-01

    The focus of this paper examines how dual language education (DLE) programs are valuable. The literature shows that children do much more than just thrive in a dual language environment. According to research, children who are bilingual are cognitively, academically, intellectually, socially and verbally more advantaged than their monolingual…

  12. Dual-horizon Peridynamics

    CERN Document Server

    Ren, Huilong; Cai, Yongchang; Rabczuk, Timon

    2015-01-01

    In this paper we develop a new Peridynamic approach that naturally includes varying horizon sizes and completely solves the "ghost force" issue. Therefore, the concept of dual-horizon is introduced to consider the unbalanced interactions between the particles with different horizon sizes. The present formulation is proved to fulfill both the balances of linear momentum and angular momentum. Neither the "partial stress tensor" nor the "`slice" technique are needed to ameliorate the ghost force issue in \\cite{Silling2014}. The consistency of reaction forces is naturally fulfilled by a unified simple formulation. The method can be easily implemented to any existing peridynamics code with minimal changes. A simple adaptive refinement procedure is proposed minimizing the computational cost. The method is applied here to the three Peridynamic formulations, namely bond based, ordinary state based and non-ordinary state based Peridynamics. Both two- and three- dimensional examples including the Kalthof-Winkler experi...

  13. Dual Criteria Decisions

    DEFF Research Database (Denmark)

    Andersen, Steffen; Harrison, Glenn W.; Lau, Morten Igel;

    2014-01-01

    The most popular models of decision making use a single criterion to evaluate projects or lotteries. However, decision makers may actually consider multiple criteria when evaluating projects. We consider a dual criteria model from psychology. This model integrates the familiar tradeoffs between...... risk and utility that economists traditionally assume, allowance for rank-dependent decision weights, and consideration of income thresholds. We examine the issues involved in full maximum likelihood estimation of the model using observed choice data. We propose a general method for integrating...... the multiple criteria, using the logic of mixture models, which we believe is attractive from a decision-theoretic and statistical perspective. The model is applied to observed choices from a major natural experiment involving intrinsically dynamic choices over highly skewed outcomes. The evidence points...

  14. Crescimento de filmes finos cristalinos de dióxido de titânio por sistemas magnetron sputtering.

    OpenAIRE

    Diego Alexandre Duarte

    2010-01-01

    Nesse trabalho é reportado o crescimento de filmes finos de dióxido de titânio (TiO2) por duas técnicas assistidas a plasma chamadas magnetron sputtering convencional (MSC) e magnetron sputtering catodo oco (MSCO). O dióxido de titânio foi crescido sobre substratos de silício, variando alguns parâmetros de plasma como, por exemplo, a distância axial (z0) e a concentração de oxigênio na mistura Ar+O2. As amostras foram caracterizadas por perfilometria, microscopia de força atômica (MFA) e difr...

  15. Preliminary Results of Nb Thin Film Coating for HIE-ISOLDE SRF Cavities Obtained by Magnetron Sputtering

    CERN Document Server

    Sublet, A; Calatroni, S; D'Elia, A; Jecklin, N; Mondino, I; Prunet, S; Therasse, M; Venturini Delsolaro, W; Zhang, P

    2013-01-01

    In the context of the HIE-ISOLDE upgrade at CERN, several new facilities for the niobium sputter coating of QWR-type superconducting RF accelerating cavities have been developed, built, and successfully operated. In order to further optimize the production process of these cavities the magnetron sputtering technique has been further investigated and continued as an alternative to the already successfully operational DC bias diode sputtering method. The purpose of this poster is to present the results obtained with this technique. The Nb thickness profile along the cavity and its correlation with the electro-magnetic field distribution inside the cavity are discussed. Film structure, morphology and Residual Resistivity Ratio (RRR) will be considered as well and compared with films obtained by DC bias diode sputtering. Finally these results will be compared with RF measurement of a production-like magnetron-coated cavity.

  16. High-power magnetron transmitter as an RF source for the electron collider ring of the MEIC facility

    CERN Document Server

    Kazakevich, G

    2014-01-01

    A novel concept of high-power transmitters utilizing the Continuous Wave (CW) magnetrons, frequency-locked by phase-modulated signals has been proposed to compensate energy losses caused by Synchrotron Radiation (SR) in the electron ring of the MEIC facility. At operating frequency of about 750 MHz the SR losses are ~2 MW. They can be compensated by some number of Superconducting RF (SRF) cavities at the feeding power of about 100-200 kW per cavity. A high-power CW transmitters, based on magnetrons, frequency-locked by phase-modulated signal, allowing a wide-band control in phase and power, and associated with a wide-band closed feedback loop are proposed to feed the SRF cavities to compensate the SR losses of the electron beam in the MEIC collider electron ring.

  17. Effect of ion bombardment on the surface morphology of Zn-films sputtered in an unbalanced magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Musil, J.; Matous, J.; Valvoda, V. [Academy of Sciences, Prague (Czech Republic). Inst. of Physics

    1995-02-01

    It is well known that magnetron sputtered films of low melting point T{sub m} materials have (due to their crystallisation at low substrate temperatures, T < 100{sup o}C) rough and diffusely reflecting surfaces, even when thin, for instance about 20 nm for In films. Only extremely thin films have a smooth and specular reflecting surface. This paper reports on the possibility of sputtering thick films of low T{sub m} materials with a smooth, optically specular reflecting surface using an unbalanced magnetron. To demonstrate this possibility, Zn films were studied and it was shown that a surface roughness of the film can be effectively controlled by ion bombardment of the film during growth. The smoothing of the Zn film does not depend on film thickness but on ion bombardment of the growing film. (author).

  18. Residual stress and texture in Aluminum doped Zinc Oxide layers deposited by reactive radio frequency magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Azanza Ricardo, C.L., E-mail: Cristy.Azanza@ing.unitn.it [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Pastorelli, M.; D' Incau, M. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Aswath, P. [College of Engineering, University of Texas at Arlington, TX (United States); Scardi, P. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy)

    2016-04-30

    Aluminum doped Zinc Oxide thin films were deposited on standard soda-lime substrates by reactive radio frequency magnetron sputtering. Residual stress and texture were studied by X-ray diffraction, while X-ray Absorption Near Edge Spectroscopy provided information on the Al environment in the best performing thin films. The influence of deposition parameters on structural and microstructural properties is discussed. A correlation between microstructure and residual stress state with electrical and optical properties is proposed. - Highlights: • Al doped ZnO thin films were obtained by reactive radio frequency magnetron sputtering. • Correlation of stresses and texture with electrical and optical properties is shown. • Homogeneous and stress-free thin-films are the best performing ones. • XANES confirmed the doping mechanism and excluded some spurious phases.

  19. Analysis of work and efficiency increase of of the ILUR-03 installation magnetron system for tubular specimens outer surface modification

    Science.gov (United States)

    Kalin, B. A.; Volkov, N. V.; Valikov, R. A.; Yashin, A. S.; Krivobokov, V. P.; Yanin, S. N.; Yuriev, Yu N.

    2017-05-01

    The method of material near-surface layers doping by mixing of alloying elements films with ion beam is widely used in science and technology. Three magnetrons with independent power systems, integrated in installation for ion-beam treatment of long-range products ILUR-03, were used as deposition systems. Targets for magnetrons were in the form of disks 60 mm diameter and 5 mm thickness and consisted of the following elements: Al, Fe, Mo, Zr, Cr of purity better than 99.99 at.%. Deposition was performed in argon atmosphere at 1-5 Pa pressure and room temperature in stable current mode at 30-100 mA. Analysis of the obtained films on the surface of cylindrical specimens from zirconium alloys with the outer diameter of 9.15 mm showed high uniformity of coating on length of 300 mm, good adhesion and absence of discontinuities in the films body.

  20. Experiments on a relativistic magnetron driven by a microsecond electron beam accelerator with a ceramic insulating stack

    Science.gov (United States)

    Lopez, Mike Rodriguez

    2003-10-01

    Relativistic magnetron experiments with a 6-vane, Titan tube have generated over 300 MW total microwave output power near 1 GHz. These experiments were driven by a long-pulse, e-beam accelerator. Parameters of the device were voltage = -0.3 to -0.4 MV, current = 1--10 kA, and pulselength = 0.5 microsecond. This body of work investigated pulse-shortening in the relativistic magnetron. Microwave generation with a conventional plastic insulator was compared to that with a new ceramic insulator. The ceramic insulator improved the vacuum by an order of magnitude (1 x 10-7 Torr) and increased voltage stability of the accelerator. The effect of RF breakdown in the waveguide on the intensity and duration of high power microwaves were also investigated. These experiments found that when SF6 gas was introduced into the waveguide, the measured efficiency, power, and pulselength of microwaves increased. Two different microwave extraction mechanisms were used. In the first system, two waveguides were connected to the magnetron pi-radians from each other. The second system used three waveguides to connect to the magnetron's extraction ports at 2pi/3 radians from each other. Microwaves were extracted into and measured from the waveguide. Pulselengths were found to be in the range of 10--200 ns. The theoretical investigation calculates the maximum injected current for a time-independent cycloidal flow in a relativistic, magnetically insulated diode. The analytical theory of Lovelace-Ott was extended by relaxing the space charge limited (SCL) assumption. This theory reduced to Christenson's results in the deeply non-relativistic regime, and to Lovelace-Ott under SCL. This theory has been successfully tested against relativistic PIC code simulations.

  1. Fabrication and characterization of anatase/rutile–TiO2 thin films by magnetron sputtering: a review

    Directory of Open Access Journals (Sweden)

    Sakae Tanemura, Lei Miao, Wilfried Wunderlich, Masaki Tanemura, Yukimasa Mori, Shoichi Toh and Kenji Kaneko

    2005-01-01

    Full Text Available This review article summarizes briefly some important achievements of our recent reserach on anatase and/or rutile TiO2 thin films, fabricated by helicon RF magnetron sputtering, with good crystal quality and high density, and gives the-state-of-the-art of the knowledge on systematic interrelationship for fabrication conditions, crystal structure, composition, optical properties, and bactericidal abilities, and on the effective surface treatment to improve the optical reactivity of the obtained films.

  2. MgB{sub 2} superconducting thin films sequentially fabricated using DC magnetron sputtering and thermionic vacuum arc method

    Energy Technology Data Exchange (ETDEWEB)

    Okur, S. [Physics Department, Izmir Institute of Technology (Turkey)], E-mail: salihokur@iyte.edu.tr; Kalkanci, M. [Material Science Program, Izmir Institute of Technology (Turkey); Pat, S.; Ekem, N.; Akan, T. [Physics Department, Osmangazi University (Turkey); Balbag, Z. [Department of Science and Mathematics Education, Osmangazi University (Turkey); Musa, G. [Plasma and Radiation, National Institute for Physics of Laser (Romania); Tanoglu, M. [Mechanical Engineering Department, Izmir Institute of Technology (Turkey)

    2007-11-01

    In this work, we discuss fabrication and characterization of MgB{sub 2} thin films obtained by sequential deposition and annealing of sandwich like Mg/B/Mg thin films on glass substrates. Mg and B films were prepared using DC magnetron sputtering and thermionic vacuum arc techniques, respectively. The MgB{sub 2} thin films showed superconducting critical transition at 33 K after annealing at 650 deg. C.

  3. The Photocatalytic Activity and Compact Layer Characteristics of TiO2 Films Prepared Using Radio Frequency Magnetron Sputtering

    OpenAIRE

    Chang, H. C.; Huang, H. H.; Wu, C. Y.; Hsu, R. Q.; C. Y. Hsu

    2014-01-01

    TiO2 compact layers are used in dye-sensitized solar cells (DSSCs) to prevent charge recombination between the electrolyte and the transparent conductive substrate (indium tin oxide, ITO; fluorine-doped tin oxide, FTO). Thin TiO2 compact layers are deposited onto ITO/glass by means of radio frequency (rf) magnetron sputtering, using deposition parameters that ensure greater photocatalytic activity and increased DSSC conversion efficiency. The photoinduced decomposition of methylene blue (MB) ...

  4. Morphology control of tungsten nanorods grown by glancing angle RF magnetron sputtering under variable argon pressure and flow rate

    Science.gov (United States)

    Khedir, Khedir R.; Kannarpady, Ganesh K.; Ishihara, Hidetaka; Woo, Justin; Ryerson, Charles; Biris, Alexandru S.

    2010-09-01

    Morphologically novel tungsten nanorods (WNRs) with the co-existence of two crystalline phases, α-W (thermodynamically stable) and β-W, were fabricated by glancing angle RF magnetron sputtering technique under various Ar pressures and flow rates. For these nanorods, a significant variation in their morphology and surface roughness was observed. These structures could be useful in a wide range of applications such as field emission, robust superhydrophobic coatings, energy, and medicine.

  5. PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

    Institute of Scientific and Technical Information of China (English)

    L.S. Yin; H. Shen; J.X. Zhang

    2002-01-01

    Ti thin films were firstly deposited on glass substrates by magnetron sputtering method,then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thinfilms on glass substrates were obtained. The structure and surface morphologies ofthe thin films were characterized by X-ray diffraction and SEM. The growth processof the thin filns has been observed. The annealing time and annealing temperatureshave an affect on the growth of the films.

  6. Vehicle Exhaust Gas Clearance by Low Temperature Plasma-Driven Nano-Titanium Dioxide Film Prepared by Radiofrequency Magnetron Sputtering

    OpenAIRE

    Shuang Yu; Yongdong Liang; Shujun Sun; Kai Zhang; Jue Zhang; Jing Fang

    2013-01-01

    A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on t...

  7. Origin of the energetic ion beams at the substrate generated during high power pulsed magnetron sputtering of titanium

    CERN Document Server

    Maszl, Christian; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    High power pulsed magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these energetic ions in HiPIMS is still an open issue, which is unraveled by using three fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\\mu$s, phase resolved optical emission spectroscopy with 1 $\\mu$s and the rotating shutter experiment with a resolution of 50 $\\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^+$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^{+}$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, ...

  8. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom)

    2015-05-01

    Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films.

  9. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering.

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-20

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

  10. Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

    Science.gov (United States)

    Saikia, P.; Bhuyan, H.; Diaz-Droguett, D. E.; Guzman, F.; Mändl, S.; Saikia, B. K.; Favre, M.; Maze, J. R.; Wyndham, E.

    2016-06-01

    The properties and performance of thin films deposited by plasma assisted processes are closely related to their manufacturing techniques and processes. The objective of the current study is to investigate the modification of plasma parameters occurring during hydrogen addition in N2  +  Ar magnetron plasma used for titanium nitride thin film deposition, and to correlate the measured properties of the deposited thin film with the bulk plasma parameters of the magnetron discharge. From the Langmuir probe measurements, it was observed that the addition of hydrogen led to a decrease of electron density from 8.6 to 6.2  ×  (1014 m-3) and a corresponding increase of electron temperature from 6.30 to 6.74 eV. The optical emission spectroscopy study reveals that with addition of hydrogen, the density of argon ions decreases. The various positive ion species involving hydrogen are found to increase with increase of hydrogen partial pressure in the chamber. The thin films deposited were characterized using standard surface diagnostic tools such as x-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), Raman spectroscopy (RS), scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS). Although it was possible to deposit thin films of titanium nitride with hydrogen addition in nitrogen added argon magnetron plasma, the quality of the thin films deteriorates with higher hydrogen partial pressures.

  11. Bonding and bio-properties of hybrid laser/magnetron Cr-enriched DLC layers

    Energy Technology Data Exchange (ETDEWEB)

    Jelinek, Miroslav, E-mail: jelinek@fzu.cz [Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Na Slovance 2, 18221 Prague (Czech Republic); Czech Technical University in Prague, Faculty of Biomedical Engineering, nam. Sitna 3105, 27201 Kladno (Czech Republic); Zemek, Josef [Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Na Slovance 2, 18221 Prague (Czech Republic); Vandrovcová, Marta; Bačáková, Lucie [Institute of Physiology of the Czech Academy of Sciences of the Czech Republic, v.v.i., Videnska 1083, 14220 Prague 4 (Czech Republic); Kocourek, Tomáš; Remsa, Jan; Písařík, Petr [Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Na Slovance 2, 18221 Prague (Czech Republic); Czech Technical University in Prague, Faculty of Biomedical Engineering, nam. Sitna 3105, 27201 Kladno (Czech Republic)

    2016-01-01

    Chromium-enriched diamond-like carbon (DLC) layers were prepared by a hybrid technology using a combination of pulsed laser deposition (PLD) and magnetron sputtering. XRD revealed no chromium peaks, indicating that the layers are mostly amorphous. Carbon (sp{sup 2} and sp{sup 3} bonds) and chromium bonds were determined by XPS from C 1s, O 1s, and Cr 2p photoelectron peaks. Depending on the deposition conditions, the concentration of Cr in DLC layers moved from zero to 10 at.% for as-received sample surfaces, and to about 31 at.% after mild sputter-cleaning by argon ion cluster beam. It should be noted that the most stable Cr{sup 3+} bonding state is in Cr{sub 2}O{sub 3} and Cr(OH){sub 3}, and that there is the toxic Cr{sup 6+} state in CrO{sub 3}. The surface content of hexavalent chromium in the Cr 2p3/2 spectra is rather low, but discernible. The population density of Saos-2 cells was the highest in samples containing higher concentrations of chromium 7.7 and 10 at.%. This means that higher concentrations of chromium supported the cell adhesion and proliferation. In addition, as revealed by a LIVE/DEAD viability/cytotoxicity kit, the cells on all Cr-containing samples maintained high viability (96 to 99%) on days 1 and 3 after seeding. However, this seemingly positive cell behavior could be associated with the risk of dedifferentiation and oncogenic transformation of cells. - Highlights: • DLC and chromium-enriched DLC layers were prepared by hybrid laser–magnetron deposition. • The content of chromium in DLC varied up to 10 at.% (31 at.% after ion beam sputtering). • The surface content of toxic hexavalent chromium in the Cr 2p3/2 spectra is rather low but discernible. • Higher concentrations of chromium supported the cell adhesion and proliferation. • Cells on all Cr-containing samples maintained high viability (96 to 99%).

  12. Characterization of amorphous and nanocomposite Nb–Si–C thin films deposited by DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Nedfors, Nils, E-mail: nils.nedfors@kemi.uu.se [Department of Chemistry, The Ångström Laboratory, Uppsala University, SE-751 21 Uppsala (Sweden); Tengstrand, Olof [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Flink, Axel [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Impact Coatings AB, Westmansgatan 29, SE-582-16 Linköping (Sweden); Eklund, Per; Hultman, Lars [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Jansson, Ulf [Department of Chemistry, The Ångström Laboratory, Uppsala University, SE-751 21 Uppsala (Sweden)

    2013-10-31

    Two series of Nb–Si–C thin films of different composition have been deposited using DC magnetron sputtering. In the first series the carbon content was kept at about 55 at.% while the Si/Nb ratio was varied and in the second series the C/Nb ratio was varied instead while the Si content was kept at about 45 at.%. The microstructure is strongly dependent on Si content and Nb–Si–C films containing more than 25 at.% Si exhibit an amorphous structure as determined by X-ray diffraction. Transmission electron microscopy, however, induces crystallisation during analysis, thus obstructing a more detailed analysis of the amorphous structure. X-ray photo-electron spectroscopy suggests that the amorphous films consist of a mixture of chemical bonds such as Nb–Si, Nb–C, and Si–C. The addition of Si results in a hardness decrease from 22 GPa for the binary Nb–C film to 18 – 19 GPa for the Si-containing films, while film resistivity increases from 211 μΩcm to 3215 μΩcm. Comparison with recently published results on DC magnetron sputtered Zr–Si–C films, deposited in the same system using the same Ar-plasma pressure, bias, and a slightly lower substrate temperature (300 °C instead of 350 °C), shows that hardness is primarily dependent on the amount of Si–C bonds rather than type of transition metal. The reduced elastic modulus on the other hand shows a dependency on the type of transition metal for the films. These trends for the mechanical properties suggest that high wear resistant (high H/E and H{sup 3}/E{sup 2} ratio) Me–Si–C films can be achieved by appropriate choice of film composition and transition metal. - Highlights: • Si reduces crystallinity, amorphous structure for films containing > 25 at.% Si. • Electron beam induced crystallization during transmission electron microscopy. • Hardness and resistivity are primarily dependent on the relative amount of C–Si bonds.

  13. Dual of QCD with One Adjoint Fermion

    DEFF Research Database (Denmark)

    Mojaza, Matin; Nardecchia, Marco; Pica, Claudio;

    2011-01-01

    We construct the magnetic dual of QCD with one adjoint Weyl fermion. The dual is a consistent solution of the 't Hooft anomaly matching conditions, allows for flavor decoupling and remarkably constitutes the first nonsupersymmetric dual valid for any number of colors. The dual allows to bound the...

  14. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  15. The Man of Dual Nationality.

    Science.gov (United States)

    Abe, Yoshio

    1985-01-01

    Presents an English translation of the first few pages, set in a Japanese internment camp in the U.S. during World War II, of a Japanese novel about the problems of dual nationality and personal identity. (KH)

  16. The effect of Al content, substrate temperature and nitrogen flow rate on optical band gap and optical features of nanostructured TiAlN thin films prepared by reactive magnetron sputtering

    Science.gov (United States)

    Jalali, Reza; Parhizkar, Mojtaba; Bidadi, Hassan; Naghshara, Hamid; Hosseini, Seyd Reza; Jafari, Majid

    2016-11-01

    In the present work, TiAlN thin films were prepared by using a dual reactive magnetron sputtering system on fused quartz substrates kept at room temperature and 400 °C; keeping nitrogen flow at 0.51 and 2.78 sccm, various DC and RF powers and the effect of these factors have been studied on the optical properties of the layers. The optical properties including absorption and transmission were studied by a UV-Visible spectrophotometer in the wavelength region (200-1100) nm. By plotting ( αhν)2 and ( αhν)1/2 versus the photon energy hυ, the optical band gap was evaluated. Experimental results show that layers with high percentage of aluminum and nitrogen have higher gap with respect to layers having high titanium percentage. TiAlN thin films deposited with 2.78 sccm nitrogen flow rate possess optical direct band gap in the range of 3.8-5.1 eV and optical indirect band gap in the range of 1.1-3.4 eV. The variation of optical band gap of the films that deposited on the substrate with 400 °C and nitrogen flow rate of 2.78 sccm was different from other layers.

  17. Chromium-doped DLC for implants prepared by laser-magnetron deposition.

    Science.gov (United States)

    Jelinek, Miroslav; Kocourek, Tomáš; Zemek, Josef; Mikšovský, Jan; Kubinová, Šárka; Remsa, Jan; Kopeček, Jaromir; Jurek, Karel

    2015-01-01

    Diamond-like carbon (DLC) thin films are frequently used for coating of implants. The problem of DLC layers lies in bad layer adhesion to metal implants. Chromium is used as a dopant for improvement of adhesion of DLC films. DLC and Cr-DLC layers were deposited on silicon, Ti6Al4V and CoCrMo substrates by a hybrid technology using combination of pulsed laser deposition (PLD) and magnetron sputtering. The topology of layers was studied using SEM, AFM and mechanical profilometer. Carbon and chromium content and concentration of trivalent and toxic hexavalent chromium bonds were determined by XPS and WDS. It follows from the scratch tests that Cr doping improved adhesion of DLC layers. Ethylene glycol, diiodomethane and deionized water were used to measure the contact angles. The surface free energy (SFE) was calculated. The antibacterial properties were studied using Pseudomonas aeruginosa and Staphylococcus aureus bacteria. The influence of SFE, hydrophobicity and surface roughness on antibacterial ability of doped layers is discussed.

  18. Studies on Nanostructure Aluminium Thin Film Coatings Deposited using DC magnetron Sputtering Process

    Science.gov (United States)

    Singh M, Muralidhar; G, Vijaya; MS, Krupashankara; Sridhara, B. K.; Shridhar, T. N.

    2016-09-01

    Nanostructured thin film metallic coatings has become an area of intense research particularly in applications related solar, sensor technologies and many other optical applications such as laser windows, mirrors and reflectors. Thin film metallic coatings were deposited using DC magnetron sputtering process. The deposition rate was varied to study its influence on optical behavior of Aluminum thin films at a different argon flow rate. Studies on the optical response of these nanostructure thin film coatings were characterized using UV-VIS-NIR spectrophotometer with integrating sphere in the wavelength range of (250-2500nm) and Surface morphology were carried out using atomic force microscope with roughness ranging from 2 to 20nm and thickness was measured using Dektak measuring instrument. The reflection behavior of aluminium coatings on polycarbonate substrates has been evaluated. UV-VIS-NIR Spectrophotometer analysis indicates higher reflectance of 96% for all the films in the wavelength range of 250 nm to 2500 nm. Nano indentation study revealed that there was a considerable change in hardness values of the films prepared at different conditions.

  19. Controllable transition from positive space charge to negative space charge in an inverted cylindrical magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Rane, R., E-mail: ramu@ipr.res.in; Ranjan, M.; Mukherjee, S. [FCIPT, Institute for Plasma Research, Gandhinagar-382044 (India); Bandyopadhyay, M. [ITER-India, Institute for Plasma Research, Gandhinagar-382044 (India)

    2016-01-15

    The combined effect of magnetic field (B), gas pressure (P), and the corresponding discharge voltage on the discharge properties of argon in inverted cylindrical magnetron has been investigated. In the experiment, anode is biased with continuous 10 ms sinusoidal half wave. It is observed that at a comparatively higher magnetic field (i.e., >200 gauss) and lower operating pressure (i.e., <1 × 10{sup −3} mbar), the discharge extinguishes and demands a high voltage to reignite. Discharge current increases with increase in magnetic field and starts reducing at sufficiently higher magnetic field for a particular discharge voltage due to restricted electron diffusion towards the anode. It is observed that B/P ratio plays an important role in sustaining the discharge and is constant for a discharge voltage. The discharge is transformed to negative space charge regime from positive space charge regime at certain B/P ratio and this ratio varies linearly with the discharge voltage. The space charge reversal is indicated by the radial profile of the floating potential and plasma potential in between two electrodes for different magnetic fields. At a particular higher magnetic field (beyond 100 gauss), the floating potential increases gradually with the radial distance from cathode, whereas it remains almost constant at lower magnetic field.

  20. Characterization of magnetron co-sputtered W-doped C-based films

    Energy Technology Data Exchange (ETDEWEB)

    Moura e Silva, C.W. [REDEMAT/CETEC - Laboratorio de Engenharia e Modificacoes de Superficies, CETEC, Av. Jose Candido da Silveira, 2000, Horto, 31.170-000, Belo Horizonte, Minas Gerais (Brazil); Branco, J.R.T. [REDEMAT/CETEC - Laboratorio de Engenharia e Modificacoes de Superficies, CETEC, Av. Jose Candido da Silveira, 2000, Horto, 31.170-000, Belo Horizonte, Minas Gerais (Brazil); Cavaleiro, A. [ICEMS - Grupo de Materiais e Engenharia de Superficies, Faculdade de Ciencias e Tecnologia da Universidade de Coimbra - Polo II - Pinhal de Marrocos, 3030-788 Coimbra (Portugal)]. E-mail: albano.cavaleiro@dem.uc.pt

    2006-11-23

    In this paper, W-doped C-based coatings were deposited on steel and silicon substrates by RF magnetron sputtering, using W and C targets, varying the cathode power applied to the W target and the substrate bias. The chemical composition was varied by placing the substrates in a row facing the C and W targets. W content in the films increased from 1 to 2 at.% over the C target to {approx} 73 at.% over the W target. The coatings with W content lower than {approx} 12 at.% and {approx} 23 at.%, for biased and unbiased conditions, respectively, showed X-ray amorphous structures, although carbide nanocrystals must exist as shown by the detection of the WC{sub 1-x} phase in films with higher W content. C-rich films were very dense and developed a columnar morphology with increasing W content. An improvement in the hardness (from 10 GPa, up to 25 GPa) of the films was achieved either when negative substrate bias was used in the deposition, or when the WC{sub 1-x} phase was detected by X-ray diffraction. The adhesion of the coatings is very low with spontaneous spallation of those deposited with negative substrate bias higher than 45 V. Varieties in cathode power (90 W or 120 W) applied to the W target showed no observable influence on the characteristics of the films.

  1. Nanostructured multilayers of TiN/ZrN obtained by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Caicedo A., J.C. [CDT ASTIN, SENA Regional Valle, Cali (Colombia); Grupo de Peliculas Delgadas, Universidad del Valle (Colombia); Centro de Excelencia en Nuevos Materiales, CENM, Universidad del Valle (Colombia); Bejarano G., G. [CDT ASTIN, SENA Regional Valle, Cali (Colombia); Group of Corrosion and Protection, Antioquia University, Medellin (Colombia); Gomez, M.E. [Grupo de Peliculas Delgadas, Universidad del Valle (Colombia); Centro de Excelencia en Nuevos Materiales, CENM, Universidad del Valle (Colombia); Prieto, P. [Centro de Excelencia en Nuevos Materiales, CENM, Universidad del Valle (Colombia); Cortez, C.; Munoz, J. [Centro de Investigacion y Estudios Avanzados del CINVESTAV-IPN, Queretaro (Mexico)

    2007-07-01

    In order to find an industrial application for thin films of TiN and ZrN monolayers, as well as TiN/ZrN multilayers were deposited onto silicon (100) and AISI 5160 steel substrates by r.f. (13.56 MHz) multi-target magnetron sputtering from high-purity (99.5%) Ti and (99.5%) Zr targets in an Ar (93%)/N{sub 2} (7%) gas mixture. For their deposition, we applied a substrate bias voltage of -100 V and a target power of 350 W. The films were deposited at a pressure of 6x10{sup -3} mbar and a temperature of 250 C. The structure, composition, morphology, and topography were characterized by, XRD, FTIR, SEM, AFM, and optical microscopy. Mechanical properties like hardness and elastic modulus were determined by Nanoindentation. Hardness and elastic modulus of the films increased proportionally to the number of bilayers. Finally, cutting tools were coated with 1, 2, 3, 4, 5, 6, 7, and 8 bilayers of TiN/ZrN. Cutting tests on paper blades were conducted. Increased cut quality performance was observed for cutting tools coated with 8 bilayers, as compared to uncoated tools. This work opens the possibility to use coated AISI 5160 as cutting tools for the paper industry, reducing the import of expensive high-quality tool steel. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  2. Low friction coefficient coatings Ni-Cr by magnetron sputtering, DC

    Energy Technology Data Exchange (ETDEWEB)

    Morales-Hernandez, J.; Mandujano-Ruiz, A.; Torres-Gonzalez, J.; Espinosa-Beltran, F. J.; Herrera-Hernandez, H.

    2015-07-01

    Magnetron Sputter Deposition technique with DC was used for the deposition of Ni-Cr coatings on AISI 316 SS like substrate. The cathode with a nominal composition Ni-22 at% Cr was prepared by Mechanical Alloying (MA) technique, with a maximum milling time of 16 hours and, with a high energy SPEX 8000 mill. The coatings were made under Argon atmosphere at room temperature with a power of 100 W at different times of growth. Chemical composition, microstructure, topography, nano hardness and wear of the coatings were evaluated using the techniques of microanalysis by energy dispersive X-ray analyzer (EDAX), X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Nano-indentation and pin-on-Disk, respectively. After milling, was not detected contamination in the mixtures. XRD analysis revealed that the microstructure of the Ni-Cr alloy was maintained in the coatings with respect to MA powders, with some degree of recrystallization. Nano hardness values were in the order of 8.8 GPa with a Youngs modulus of 195 GPa. The adhesion of the films was evaluated according to their resistance to fracture when these were indented at different loads using Vickers microhardness. The wear test results showed a decrease in the friction coefficient with respect to the increase of thickness films, getting a minimum value of 0.08 with a thickness of 1 μm and which correspond with the maximum growing time. (Author)

  3. Vibrational spectroscopy characterization of magnetron sputtered silicon oxide and silicon oxynitride films

    Energy Technology Data Exchange (ETDEWEB)

    Godinho, V., E-mail: godinho@icmse.csic.es [Instituto de Ciencia de Materiales de Sevilla-CSIC/US, Avda. Americo Vespucio no 49, 41092 Seville (Spain); Universite Libre de Bruxelles, Avenue F.D. Roosevelt 50, B 1050 Bruxelles (Belgium); Denisov, V.N.; Mavrin, B.N.; Novikova, N.N.; Vinogradov, E.A.; Yakovlev, V.A. [Institute for Spectroscopy - Russian Academy of Sciences, 142190, Troitsk, Moscow reg. (Russian Federation); Fernandez-Ramos, C. [Instituto de Ciencia de Materiales de Sevilla-CSIC/US, Avda. Americo Vespucio no 49, 41092 Seville (Spain); Institute for Prospective and Technological Studies-JRC European Commission, C/Inca Garcilaso s/n, 41092 Seville (Spain); Jimenez de Haro, M.C.; Fernandez, A. [Instituto de Ciencia de Materiales de Sevilla-CSIC/US, Avda. Americo Vespucio no 49, 41092 Seville (Spain)

    2009-10-15

    Vibrational (infrared and Raman) spectroscopy has been used to characterize SiO{sub x}N{sub y} and SiO{sub x} films prepared by magnetron sputtering on steel and silicon substrates. Interference bands in the infrared reflectivity measurements provided the film thickness and the dielectric function of the films. Vibrational modes bands were obtained both from infrared and Raman spectra providing useful information on the bonding structure and the microstructure (formation of nano-voids in some coatings) for these amorphous (or nanocrystalline) coatings. X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) analysis have also been carried out to determine the composition and texture of the films, and to correlate these data with the vibrational spectroscopy studies. The angular dependence of the reflectivity spectra provides the dispersion of vibrational and interference polaritons modes, what allows to separate these two types of bands especially in the frequency regions where overlaps/resonances occurred. Finally the attenuated total reflection Fourier transform infrared measurements have been also carried out demonstrating the feasibility and high sensitivity of the technique. Comparison of the spectra of the SiO{sub x}N{sub y} films prepared in various conditions demonstrates how films can be prepared from pure silicon oxide to silicon oxynitride with reduced oxygen content.

  4. Biocompatibility of GaSb thin films grown by RF magnetron sputtering

    Science.gov (United States)

    Nishimoto, Naoki; Fujihara, Junko; Yoshino, Katsumi

    2017-07-01

    GaSb may be suitable for biological applications, such as cellular sensors and bio-medical instrumentation because of its low toxicity compared with As (III) compounds and its band gap energy. Therefore, the biocompatibility and the film properties under physiological conditions were investigated for GaSb thin films with or without a surface coating. GaSb thin films were grown on quartz substrates by RF magnetron sputtering, and then coated with (3-mercaptopropyl) trimethoxysilane (MPT). The electrical properties, surface morphology, and crystal structure of the GaSb thin film were unaffected by the MPT coating. The cell viability assay suggested that MPT-coated GaSb thin films are biocompatible. Bare GaSb was particularly unstable in pH9 buffer. Ga elution was prevented by the MPT coating, although the Ga concentration in the pH 9 buffer was higher than that in the other solutions. The surface morphology and crystal structure were not changed by exposure to the solutions, except for the pH 9 buffer, and the thin film properties of MPT-coated GaSb exposed to distilled water and H2O2 in saline were maintained. These results indicate that MPT-coated GaSb thin films are biocompatible and could be used for temporary biomedical devices.

  5. Microstructure and magnetic properties of FePt/MgO multilayers deposited by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Xiaoli Li; Fang Wang; Fengxian Jiang; Xiaohong Xu; Haishun Wu

    2008-01-01

    FePt (50 rim) and [FePt(a nm)/MgO(b nm)]5/glass (a=1, 2, 3; b=1, 2, 3)films Were prepared by radio frequency (RF) magnetron sputtering technique, and then were annealed at 600℃ for 30 min. The effect of MgO layer thickness on the structures and magnetic properties of the FePt/MgO multilayers was investigated. The coercivities and inter-grain interactions of the FePt/MgO films were decreased, yet the degree of (001) texturing drastically increased with the increase in MgO layer thickness when the FePt layer thickness was fixed. Thus, the FePt/MgO films with appropriate coercivities, high perpendicular anisotropy, and weak inter- grain interactions were obtained by controlling the MgO layer thickness. Overall, these results indicate that the FePt/MgO nanos- tructured films are promising candidates for future high-density perpendicular recording media. C 2008 University of Science and Technology Beijing. All fights reserved.

  6. Adhesion analysis for chromium nitride thin films deposited by reactive magnetron sputtering

    Science.gov (United States)

    Rusu, F. M.; Merie, V. V.; Pintea, I. M.; Molea, A.

    2016-08-01

    The thin film industry is continuously growing due to the wide range of applications that require the fabrication of advanced components such as sensors, biological implants, micro-electromechanical devices, optical coatings and so on. The selection regarding the deposition materials, as well as the deposition technology influences the properties of the material and determines the suitability of devices for certain real-world applications. This paper is focused on the adhesion force for several chromium nitride thin films obtained by reactive magnetron sputtering. All chromium nitride thin films were deposited on a silicon substrate, the discharge current and the argon flow being kept constant. The main purpose of the paper is to determine the influence of deposition parameters on the adhesion force. Therefore some of the deposition parameters were varied in order to study their effect on the adhesion force. Experimentally, the values of the adhesion force were determined in multiple points for each sample using the spectroscopy in point mode of the atomic force microscope. The obtained values were used to estimate the surface energy of the CrN thin films based on two existing mathematical models for the adhesion force when considering the contact between two bodies.

  7. Wear and corrosion behavior of W/WC bilayers deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, N.A. de [Excellence Center for Novel Materials, Universidad del Valle, Cali (Colombia); Jaramillo, H.E. [Science and Engineering of Materials Group, Department of Basic Science of Engineering, Universidad Autonoma de Occidente, Cali (Colombia); Department of Energetic and Mechanic, Universidad Autonoma de Occidente, Cali (Colombia); Bejarano, G. [Excellence Center for Novel Materials, Universidad del Valle, Cali (Colombia); Group for Engineering and Materials Development, CDT ASTIN-SENA, Cali (Colombia); Group of Corrosion and Protection, Antioquia University, Medellin (Colombia); Villamil, B.E.; Teran, G. [Richer Young, COLCIENCIAS, Cali (Colombia)

    2007-07-01

    WC/W coatings were deposited by reactive magnetron sputtering using 40%, 60% and 80% methane CH{sub 4} in the gas mixture. The bilayers were grown on to AISI 420 stainless-steel substrates in order to study the wear and corrosion behavior. Before growing the bilayers, one Ti monolayer was grown to improve the adherence of the coatings to the substrate. The wear resistance and the friction coefficient of the coatings were determined using a pin-on-disk tribometer. All coatings had a friction coefficient of about 0.5. The measured weight lost of the bilayers from each probe allowed the qualitative analysis of wear behavior all coatings. The bilayers grown with 80% methane showed the best abrasive wear resistance and adhesion without failure through the coating in the wear track for dry pin-on-disk sliding. Electrochemical corrosion test showed that the bilayers grown with 80% methane were more resistant to corrosion than the ones uncoated. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  8. Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering

    CERN Document Server

    Seino, T

    2002-01-01

    The reactive pulsed dc sputtering technique is widely used for the deposition of oxide films. The operating pressure for sputtering is commonly above 0.13 Pa. In this study, however, aluminum oxide (alumina) films were deposited at operating pressures from 0.06 to 0.4 Pa using a sputtering system equipped with a scanning magnetron cathode and a pulsed dc power supply. The pulsed dc power was found to be useful not only to reduce arcing, but also to sustain the discharge at low pressure. The electrical breakdown field, intrinsic stress, O/Al ratio, refractive index, and surface roughness were investigated. Both a low intrinsic stress and an O/Al ratio around the stoichiometry were required to get the film having a high breakdown field. A low operating pressure of 0.1 Pa was found to provide the necessary stress and O/Al ratio targets. A 50-nm-thick alumina film having a maximum breakdown field of 7.4 MV/cm was obtained.

  9. Active soft solder deposition by magnetron-sputter-ion-plating (MSIP)-PVD-process

    Energy Technology Data Exchange (ETDEWEB)

    Lugscheider, E.; Bobzin, K.; Erdle, A

    2004-01-30

    In different technical areas micro electro mechanical systems (M.E.M.S.), e.g. micro pumps, micro sensors, actuators and micro dosage systems are in use today. The components of these M.E.M.S. consist of various materials, which have to be joined. To join materials like ceramics, plastics or metals to a hybrid M.E.M.S., established joining technologies have to be adjusted. For the assembling and mounting of temperature sensible micro components, a low temperature joining process, e.g. transient liquid phase (TLP) bonding or an active soft soldering process can be performed. In this article the deposition of a low melting active soft solder by magnetron-sputter (MS)-PVD deposition with an active substrate cooling will be presented. The substrate temperatures were set and controlled by an additional cooling unit, which was integrated into the sputtering facility. In the performed experiments a substrate temperature range from -40 to +20 deg. C was investigated. The effects of these different substrate temperatures to the microstructure and the soldering suitability of the solder system were investigated by scanning electron microscopy (SEM), nanoindentation and soldering tests. The chemical composition of the deposited solder systems was examined by glow discharge optical spectroscopy (GDOS)-analysis. As a suitable substrate temperature range for deposition -10 to -20 deg. C was detected. Solder systems deposited in this temperature range showed good solder abilities.

  10. Electrical and optical properties of reactive DC magnetron sputtered silver oxide thin films: role of oxygen

    Energy Technology Data Exchange (ETDEWEB)

    Kumar Barik, Ullash; Srinivasan, S.; Nagendra, C.L.; Subrahmanyam, A

    2003-04-01

    Silver oxide thin films have been prepared on soda lime glass substrates at room temperature (300 K) by reactive DC Magnetron sputtering technique using pure silver metal target; the oxygen flow rates have been varied in the range 0.00-2.01 sccm. The X-ray diffraction data on these films show a systematic change from metallic silver to silver (sub) oxides. The electrical resistivity increases with increasing oxygen flow. The films show a p-type behavior (by both Hall and Seebeck measurements) for the oxygen flow rates of 0.54, 1.09 and 1.43 sccm. The refractive index of the films (at 632.8 nm) decreases with increasing oxygen content and is in the range 1.167-1.145, whereas the p-type films show a higher refractive index (1.186-1.204). The work function of these silver oxide films has been measured by Kelvin Probe technique. The results, in specific, the p-type conductivity in the silver oxide films, have been explained on the basis of the theory of partial ionic charge proposed by Sanderson.

  11. Antimicrobial brass coatings prepared on poly(ethylene terephthalate) textile by high power impulse magnetron sputtering.

    Science.gov (United States)

    Chen, Ying-Hung; Wu, Guo-Wei; He, Ju-Liang

    2015-03-01

    The goal of this work is to prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on poly(ethylene terephthalate) (PET) fabric by high-power impulse magnetron sputtering (HIPIMS), which is known to provide high-density plasma, so as to generate a strongly adherent film at a reduced substrate temperature. The results reveal that the brass film grows in a layer-plus-island mode. Independent of their deposition time, the obtained films retain a Cu/Zn elemental composition ratio of 1.86 and exhibit primarily an α copper phase structure. Oxygen plasma pre-treatment for 1min before coating can significantly increase film adhesion such that the brass-coated fabric of Grade 5 or Grade 4-5 can ultimately be obtained under dry and wet rubbing tests, respectively. However, a deposition time of 1min suffices to provide effective antimicrobial properties for both Staphylococcus aureus and Escherichia coli. As a whole, the feasibility of using such advanced HIPIMS coating technique to develop durable antimicrobial textile was demonstrated.

  12. Enhanced deposition of ZnO films by Li doping using radio frequency reactive magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Liang-xian Chen; Sheng Liu; Cheng-ming Li; Yi-chao Wang; Jin-long Liu; Jun-jun Wei

    2015-01-01

    Radio frequency (RF) reactive magnetron sputtering was utilized to deposit Li-doped and undoped zinc oxide (ZnO) films on sili-con wafers. Various Ar/O2 gas ratios by volume and sputtering powers were selected for each deposition process. The results demonstrate that the enhanced ZnO films are obtained via Li doping. The average deposition rate for doped ZnO films is twice more than that of the un-doped films. Both atomic force microscopy and scanning electron microscopy studies indicate that Li doping significantly contributes to the higher degree of crystallinity of wurtzite–ZnO. X-ray diffraction analysis demonstrates that Li doping promotes the (002) preferential orien-tation in Li-doped ZnO films. However, an increase in the ZnO lattice constant, broadening of the (002) peak and a decrease in the peak inte-gral area are observed in some Li-doped samples, especially as the form of Li2O. This implies that doping with Li expands the crystal struc-ture and thus induces the additional strain in the crystal lattice. The oriented-growth Li-doped ZnO will make significant applications in fu-ture surface acoustic wave devices.

  13. Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering

    CERN Document Server

    Hong, R J; Sittinger, V; Szyszka, B; Hoeing, T; Bräuer, G; Heide, G; Frischat, G H

    2002-01-01

    Al-doped zinc oxide (ZnO:Al) films were deposited on glass substrates using a reactive midfrequency magnetron sputtering process. The optical transmission and reflection as well as the electrical resistivity of the films prepared on an area of 1000x600 mm sup 2 were determined at different locations. Films with a uniform distribution of resistivity between 2.9x10 sup - sup 4 and 3.6x10 sup - sup 4 OMEGA cm and transmittance up to 88% in the visible spectral range were obtained. The ellipsometric spectra of the films were also analyzed using the Drude-Lorentz model. The calculated thicknesses of the films agreed well with those measured by a step profilometer. Secondary neutral mass spectrometry depth profiling showed uniform contents of Zn and O elements, while a slight periodic variation of the Al content was observed at different depths inside the film. A transition zone of 35-55 nm in width between the films and glass substrates due to the interdiffusion was also observed.

  14. Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Y. Ashok Kumar Reddy

    2012-12-01

    Full Text Available Nickel oxide (NiO thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic structure along (220 orientation. The optical transmittance and band gap values of the films increased with increasing the oxygen partial pressure from 1 × 10 – 4 to 5 × 10 – 4 mbar and decreased on further increasing the oxygen partial pressure. Using Scanning Electron Microscopy (SEM, fine grains were observed at oxygen partial pressure of 5 × 10 – 4 mbar. The film resistivity decreases from 90.48 to 13.24 Ω cm with increase in oxygen partial pressure to 5 × 10 – 4 mbar and then increased on further increasing the oxygen partial pressure.

  15. High entropy alloy thin films deposited by magnetron sputtering of powder targets

    Energy Technology Data Exchange (ETDEWEB)

    Braeckman, B.R., E-mail: BertR.Braeckman@Ugent.be [Department of Solid State Sciences, Ghent University, Krijgslaan 281 (S1), 9000 Gent (Belgium); Boydens, F. [Department of Solid State Sciences, Ghent University, Krijgslaan 281 (S1), 9000 Gent (Belgium); Hidalgo, H.; Dutheil, P. [GREMI, UMR7344 CNRS, Université d' Orléans, BP6744, 45067 Orléans Cedex 2 (France); Jullien, M. [Institut Jean Lamour, Université de Lorraine, UMR CNRS, 7198 Vandoeuvre-lès-Nancy (France); Thomann, A.-L. [GREMI, UMR7344 CNRS, Université d' Orléans, BP6744, 45067 Orléans Cedex 2 (France); Depla, D. [Department of Solid State Sciences, Ghent University, Krijgslaan 281 (S1), 9000 Gent (Belgium)

    2015-04-01

    High entropy alloys (HEA) contain at least five principal elements in equimolar or near-equimolar ratios. These materials crystallize typically as a face-centered cubic (FCC), body-centered cubic (BCC) solid solution or as a mixture of these two crystal structures. AlCoCrCuFeNi thin films were deposited by magnetron sputtering of homemade pressed powder targets. Four targets with different compositions were sputtered under various conditions to modify the alloy composition. Scanning electron microscopy and energy-dispersive X-ray spectroscopy were used to study the surface morphology and composition whereas X-ray diffraction and X-ray reflectivity provided information regarding the phase formation and density of the films. It is suggested that, when taking into account the atomic radii of the constituent elements, the sputter deposited alloy thin films can be topologically regarded as binary alloys of the form Al-(CoCrCuFeNi). If the concentration of the largest atom (Al) increases, a transition from FCC to BCC is noticed. This structure transition could be attributed to a critical lattice distortion. - Highlights: • AlCoCrCuFeNi thin films were deposited by sputtering pressed power targets. • Sputter deposition of powder targets allows good control over the film composition. • With increasing Al fraction, a crystallographic structure transition was noticed. • The transition was made semi-quantitative with Egami's atomic-level stress theory.

  16. Microstructural characteristics and mechanical properties of magnetron sputtered nanocrystalline TiN films on glass substrate

    Indian Academy of Sciences (India)

    Vipin Chawla; R Jayaganthan; Ramesh Chandra

    2009-04-01

    Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputtering. The microstructural characteristics of the thin films were characterized by XRD, FE-SEM and AFM. XRD analysis of the thin films, with increasing thickness, showed the (200) preferred orientation up to 1.26 m thickness and then it transformed into (220) and (200) peaks with further increase in thickness up to 2.83 m. The variation in preferred orientation was due to the competition between surface energy and strain energy during film growth. The deposited films were found to be very dense nanocrystalline film with less porosity as evident from their FE-SEM and AFM images. The surface roughness of the TiN films has increased slightly with the film thickness as observed from its AFM images. The mechanical properties of TiN films such as hardness and modulus of elasticity () were investigated by nanoindentation technique. The hardness of TiN thin film was found to be thickness dependent. The highest hardness value (24 GPa) was observed for the TiN thin films with less positive micro strain.

  17. Properties of Erbium and Ytterbium Doped Gallium Nitride Layers Fabricated by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2006-01-01

    Full Text Available We report about some properties of erbium and erbium/ytterbium doped gallium nitride (GaN layers fabricated by magnetron sputtering onsilicon, quartz and Corning glass substrates. For fabricating GaN layers two types of targets were used - gallium in a stainless steel cup anda Ga2O3 target. Deposition was carried out in the Ar+N2 gas mixture. For erbium and ytterbium doping into GaN layers, erbium metallicpowder and ytterbium powder or Er2O3 and Yb2O3 pellets were laid on the top of the target. The samples were characterized by X-raydiffraction (XRD, photoluminescence spectra and nuclear analytical methods. While the use of a metallic gallium target ensured thedeposition of well-developed polycrystalline layers, the use of gallium oxide target provided GaN films with poorly developed crystals. Bothapproaches enabled doping with erbium and ytterbium ions during deposition, and typical emission at 1 530 nm due to the Er3+ intra-4f 4I13/2 → 4I15/2 transition was observed.

  18. Antimicrobial brass coatings prepared on poly(ethylene terephthalate) textile by high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Ying-Hung, E-mail: tieamo2002@gmail.com; Wu, Guo-Wei; He, Ju-Liang

    2015-03-01

    The goal of this work is to prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on poly(ethylene terephthalate) (PET) fabric by high-power impulse magnetron sputtering (HIPIMS), which is known to provide high-density plasma, so as to generate a strongly adherent film at a reduced substrate temperature. The results reveal that the brass film grows in a layer-plus-island mode. Independent of their deposition time, the obtained films retain a Cu/Zn elemental composition ratio of 1.86 and exhibit primarily an α copper phase structure. Oxygen plasma pre-treatment for 1 min before coating can significantly increase film adhesion such that the brass-coated fabric of Grade 5 or Grade 4–5 can ultimately be obtained under dry and wet rubbing tests, respectively. However, a deposition time of 1 min suffices to provide effective antimicrobial properties for both Staphylococcus aureus and Escherichia coli. As a whole, the feasibility of using such advanced HIPIMS coating technique to develop durable antimicrobial textile was demonstrated. - Highlights: • Prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on PET fabric by HIPIMS • Brass-coated fabric with excellent durability, even undergone rubbing and washing tests • Brass-coated fabric provides effective antimicrobial properties for E. coli and S. aureus. • After brass coating, PET fabric still retained its mechanical property.

  19. C-axis orientated AlN films deposited using deep oscillation magnetron sputtering

    Science.gov (United States)

    Lin, Jianliang; Chistyakov, Roman

    2017-02-01

    Highly c-axis orientated aluminum nitride (AlN) films were deposited on silicon (100) substrates by reactive deep oscillation magnetron sputtering (DOMS). No epitaxial favored bond layer and substrate heating were applied for assisting texture growth. The effects of the peak target current density (varied from 0.39 to 0.8 Acm-2) and film thickness (varied from 0.25 to 3.3 μm) on the c-axis orientation, microstructure, residual stress and mechanical properties of the AlN films were investigated by means of X-ray diffraction rocking curve methodology, transmission electron microscopy, optical profilometry, and nanoindentation. All AlN films exhibited a preferred orientation and compressive residual stresses. At similar film thicknesses, an increase in the peak target current density to 0.53 Acm-2 improved the orientation. Further increasing the peak target current density to above 0.53 Acm-2 showed limited contribution to the texture development. The study also showed that an increase in the thickness of the AlN films deposited by DOMS improved the c-axis alignment accompanied with a reduction in the residual stress.

  20. Duty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobium

    Science.gov (United States)

    Ganesan, R.; Treverrow, B.; Murdoch, B.; Xie, D.; Ross, A. E.; Partridge, J. G.; Falconer, I. S.; McCulloch, D. G.; McKenzie, D. R.; Bilek, M. M. M.

    2016-06-01

    Instabilities in reactive sputtering have technological consequences and have been attributed to the formation of a compound layer on the target surface (‘poisoning’). Here we demonstrate how the duty cycle of high power impulse magnetron sputtering (HiPIMS) can be used to control the surface conditions of Hf and Nb targets. Variations in the time resolved target current characteristics as a function of duty cycle were attributed to gas rarefaction and to the degree of poisoning of the target surface. As the operation transitions from Ar driven sputtering to metal driven sputtering, the secondary electron emission changes and reduces the target current. The target surface transitions smoothly from a poisoned state at low duty cycles to a quasi-metallic state at high duty cycles. Appropriate selection of duty cycle increases the deposition rate, eliminates the need for active regulation of oxygen flow and enables stable reactive deposition of stoichiometric metal oxide films. A model is presented for the reactive HIPIMS process in which the target operates in a partially poisoned mode with different degrees of oxide layer distribution on its surface that depends on the duty cycle. Finally, we show that by tuning the pulse characteristics, the refractive indices of the metal oxides can be controlled without increasing the absorption coefficients, a result important for the fabrication of optical multilayer stacks.

  1. Ge Nanoislands Grown by Radio Frequency Magnetron Sputtering: Comprehensive Investigation of Surface Morphology and Optical Properties

    Directory of Open Access Journals (Sweden)

    Alireza Samavati

    2015-01-01

    Full Text Available The comprehensive investigation of the effect of growth parameters on structural and optical properties of Si-based single layer Ge nanoislands grown via Stranski-Krastanov mechanism employing radio frequency magnetron sputtering due to its high deposition rate, easy procedure, economical cost, and safety is carried out. The estimated width and height of Ge nanoislands produced by this technique are in the range of ∼8 to ∼30 and ∼2 to 8 nm, respectively. Varieties parameters are manipulated to optimize the surface morphology and structural and optical behavior of Ge nanoislands. The resulted nanoislands are analyzed using various analytical techniques including atomic force microscope, X-ray diffraction, energy dispersive X-ray spectroscopy, room temperature photoluminescence, and Raman spectroscopy. The optimum parameters for growing high quality samples having high number density and homogenous and small size distribution are found to be 400°C for substrate temperature, 300 sec for deposition time, 10 sccm for Ar flow, and 100 W for radio frequency power. The excellent features of the results suggest that our systematic investigation on the organized growth factors and their effects on surface parameters and photoluminescence emission energy may constitute a basis for the tunable growth of Ge nanoislands (100 nanoislands suitable in nanophotonics.

  2. Abrasion resistant low friction and ultra-hard magnetron sputtered AlMgB14 coatings

    Science.gov (United States)

    Grishin, A. M.

    2016-04-01

    Hard aluminum magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric AlMgB14 ceramic target. X-ray amorphous AlMgB14 films are very smooth. Their roughness does not exceed the roughness of Si wafer and Corning glass used as the substrates. Dispersion of refractive index and extinction coefficient were determined within 300 to 2500 nm range for the film deposited onto Corning glass. Stoichiometric in-depth compositionally homogeneous 2 μm thick films on the Si(100) wafer possess the peak values of nanohardness 88 GPa and Young’s modulus 517 GPa at the penetration depth of 26 nm and, respectively, 35 GPa and 275 GPa at 200 nm depth. Friction coefficient was found to be 0.06. The coating scratch adhesion strength of 14 N was obtained as the first chipping of the coating whereas its spallation failure happened at 21 N. These critical loads and the work of adhesion, estimated as high as 18.4 J m-2, surpass characteristics of diamond like carbon films deposited onto tungsten carbide-cobalt (WC-Co) substrates.

  3. Surface treatment effect on Si (111) substrate for carbon deposition using DC unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Aji, A. S., E-mail: aji.ravazes70@gmail.com; Sahdan, M. F.; Hendra, I. B.; Dinari, P.; Darma, Y. [Quantum Semiconductor and Devices Lab., Physics of Material Electronics Research Division, Department of Physics, Institut Teknologi Bandung (Indonesia)

    2015-04-16

    In this work, we studied the effect of HF treatment in silicon (111) substrate surface for depositing thin layer carbon. We performed the deposition of carbon by using DC Unbalanced Magnetron Sputtering with carbon pallet (5% Fe) as target. From SEM characterization results it can be concluded that the carbon layer on HF treated substrate is more uniform than on substrate without treated. Carbon deposition rate is higher as confirmed by AFM results if the silicon substrate is treated by HF solution. EDAX characterization results tell that silicon (111) substrate with HF treatment have more carbon fraction than substrate without treatment. These results confirmed that HF treatment on silicon Si (111) substrates could enhance the carbon deposition by using DC sputtering. Afterward, the carbon atomic arrangement on silicon (111) surface is studied by performing thermal annealing process to 900 °C. From Raman spectroscopy results, thin film carbon is not changing until 600 °C thermal budged. But, when temperature increase to 900 °C, thin film carbon is starting to diffuse to silicon (111) substrates.

  4. Ion beam analysis of TiN/Ti multilayers deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Andrade, E. E-mail: andrade@fisica.unam.mx; Flores, M.; Muhl, S.; Barradas, N.P.; Murillo, G.; Zavala, E.P.; Rocha, M.F

    2004-06-01

    TiN/Ti multilayers, 1.74-9.80 {mu}m thick, were deposited on 304 stainless steel substrates by reactive unbalanced magnetron sputtering. It is known that such multilayers can improve the corrosion resistance of the stainless steel. The titanium layers help to reduce the occurrence of pinholes that arise because of the irregularities in substrate surface, and decrease the porosity of subsequent TiN coatings by improving the layers microstructure. A 1400 keV deuterium beam was used to analyse the samples and combinations of RBS/NRA methods were applied to evaluate the sample spectra. The {sup 14}N(d,{alpha}{sub 1}) {sup 12}C NR cross sections are well known and were used as way to determine the {sup 14}N concentration in the TiN{sub x} layers. The corrosion resistance of the layers was studied by means of potentiodynamic polarization in a 0.5 M NaCl solution. The corrosion test demonstrated that the number of TiN/Ti layers and its total thickness determine the corrosion resistance.

  5. Ti-Nb thin films deposited by magnetron sputtering on stainless steel

    Energy Technology Data Exchange (ETDEWEB)

    Gonzalez, E. David; Niemeyer, Terlize C.; Afonso, Conrado R. M.; Nascente, Pedro A. P., E-mail: nascente@ufscar.br [Department of Materials Engineering, Federal University of Sao Carlos, CEP 13565-905 Sao Carlos, São Paulo (Brazil)

    2016-03-15

    Thin films of Ti-Nb alloys were deposited on AISI 316L stainless steel substrate by magnetron sputtering, and the structure, composition, morphology, and microstructure of the films were analyzed by means of x-ray diffraction (XRD), (scanning) transmission electron microscopy (TEM) coupled with energy-dispersive x-ray spectroscopy, atomic force microscopy (AFM), and x-ray photoelectron spectroscopy (XPS). Thin films of four compositions were produced: Ti{sub 85}Nb{sub 15} (Ti-26 wt. % Nb), Ti{sub 80}Nb{sub 20} (Ti-33 wt. % Nb), Ti{sub 70}Nb{sub 30} (Ti-45 wt. % Nb), and Ti{sub 60}Nb{sub 40} (Ti-56 wt. % Nb). Structural characterization by XRD indicated that only the β phase was present in the thin films and that the increase in the Nb content modified the alloy film texture. These changes in the film texture, also detected by TEM analysis, were attributed to different growth modes related to the Nb content in the alloy films. The mean grain sizes measured by AFM increased with the Nb amount (from 197 to 222 nm). XPS analysis showed a predominance of oxidized Ti and Nb on the film surfaces and an enrichment of Ti.

  6. Growth of IGZO thin films and fabrication of transparent thin film transistor by RF magnetron sputtering

    Science.gov (United States)

    Sanal, K. C.; Majeesh, M.; Jayaraj, M. K.

    2013-09-01

    n-Type transparent conducting indiuim galium zinc oxide (IGZO) films were successfully grown on glass sub- strates at room temperature by rf magnetron sputtering . Structural, optical, morphological and electrical properties of IGZO films deposited at different rf power were investigated.Composition of the film was confirmed by EDAX measurement which shows that percentage of Zn increased with the rf power. Structural studies by X-ray diffraction showed that as deposited IGZO films were amorphous. The roughness of the film was increased with increase in rf power and smooth film of average roughness 0.75nm was obtained at 40W rf power. The average transmission in the visible range was greater than 80% and the transmission in the higher wavelength re- gion decreased with increase in RF power. Refractive index of IGZO film calculated by Swanepoel technique was 1.92. The carrier concentration in IGZO films can be controlled by controlling rf which can vary Zn/(Ga+In+Zn) ratio. The bottom gate structured transparent TFTs fabricated using n-type IGZO active layers operated in enhancement mode with field effect mobility 2.5 cm2/Vs and threshold voltage 20V.

  7. The behaviour of arcs in carbon mixed-mode high-power impulse magnetron sputtering

    Science.gov (United States)

    Tucker, M. D.; Putman, K. J.; Ganesan, R.; Lattemann, M.; Stueber, M.; Ulrich, S.; Bilek, M. M. M.; McKenzie, D. R.; Marks, N. A.

    2017-04-01

    Mixed-mode deposition of carbon is an extension of high-power impulse magnetron sputtering in which a short-lived arc is deliberately allowed to ignite on the target surface to increase the ionised fraction of carbon in the deposition flux. Here we investigate the ignition and evolution of these arcs and examine their behaviour for different conditions of argon pressure, power supply voltage, and current. We find that mixed-mode deposition is sensitive to the condition of the target surface, and changing the operating parameters causes changes in the target surface condition which themselves affect the discharge in a process of negative feedback. Initially the arcs are evenly distributed on the target racetrack, but after a long period of operation the mode of erosion changes and arcs become localised in a small region, resulting in a pronounced nodular structure. We also quantify macroparticle generation and observe a power-law size distribution typical of arc discharges. Fewer particles are generated for operation at lower Ar pressure when the arc spot velocity is higher.

  8. Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

    Energy Technology Data Exchange (ETDEWEB)

    Karthikeyan, Sreejith, E-mail: s.karthikeyan@edu.salford.ac.uk; Hill, Arthur E.; Pilkington, Richard D.

    2011-10-31

    Historically, molybdenum thin films have been used as the back contact for Cu(In,Ga)Se{sub 2} based solar cells and as such the properties of these layers play an important role in the overall cell structure. This paper describes the production of molybdenum films using pulsed d.c. magnetron sputtering from compressed molybdenum powder targets. The films were deposited at different substrate temperatures under constant power and constant current modes, and analysed using X-ray diffraction, scanning electron microscopy, atomic force microscopy and four point resistance probe. Mechanical strain and resistivity were found to decrease with substrate temperature together with a shift in the (110) crystallographic plane towards higher diffraction angles. All films were well adhered to the glass substrates irrespective of their high tensile strain. Surface morphology analysis revealed the presence of nano-structured stress relief patterns which can enhance the nucleation sites for subsequent CuInSe{sub 2} deposition. A high-resolution cross sectional image showed the columnar growth of the films. Surface roughness analysis revealed that roughness increased with increase in substrate temperature.

  9. Improvements on the Stability and Operation of a Magnetron H- Ion Source

    Energy Technology Data Exchange (ETDEWEB)

    Sosa, A. [Fermilab; Bollinger, D. S. [Fermilab; Karns, P. R. [Fermilab; Tan, C. Y. [Fermilab

    2017-01-06

    The magnetron H- ion sources developed in the 1970s currently in operation at Fermilab provide beam to the rest of the accelerator complex. A series of modifications to these sources have been tested in a dedicated offline test stand with the aim of improving different operational issues. The solenoid type gas valve was tested as an alternative to the piezoelectric gas valve in order to avoid its temperature dependence. A new cesium oven was designed and tested in order to avoid glass pieces that were present with the previous oven, improve thermal insulation and fine tune its temperature. A current-regulated arc modulator was developed to run the ion source at a constant arc current, providing very stable beam outputs during operations. In order to reduce beam noise, the addition of small amounts of N2 gas was explored, as well as testing different cathode shapes with increasing plasma volume. This paper summarizes the studies and modifications done in the source over the last three years with the aim of improving its stability, reliability and overall performance.

  10. TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

    Energy Technology Data Exchange (ETDEWEB)

    Devia, D.M. [Laboratorio de Fisica del Plasma, Universidad Nacional de Colombia Sede Manizales, Cra. 27 No. 64-60, Manizales, Caldas (Colombia); Laboratorio de Materiales, Universidad Nacional de Colombia Sede Medellin, Sede Medellin, Antioquia (Colombia); Restrepo-Parra, E., E-mail: erestrepopa@unal.edu.co [Laboratorio de Fisica del Plasma, Universidad Nacional de Colombia Sede Manizales, Cra. 27 No. 64-60, Manizales, Caldas (Colombia); Arango, P.J. [Laboratorio de Fisica del Plasma, Universidad Nacional de Colombia Sede Manizales, Cra. 27 No. 64-60, Manizales, Caldas (Colombia); Tschiptschin, A.P. [Escola Politecnica da Universidade de Sao Paulo, Depto. de Engenharia Metalurgica e de Materiais, Sao Paulo, SP (Brazil); Velez, J.M. [Laboratorio de Materiales, Universidad Nacional de Colombia Sede Medellin, Sede Medellin, Antioquia (Colombia)

    2011-05-01

    TiAlN films were deposited on AISI O1 tool steel using a triode magnetron sputtering system. The bias voltage effect on the composition, thickness, crystallography, microstructure, hardness and adhesion strength was investigated. The coatings thickness and elemental composition analyses were carried out using scanning electron microscopy (SEM) together with energy dispersive X-ray (EDS). The re-sputtering effect due to the high-energy ions bombardment on the film surface influenced the coatings thickness. The films crystallography was investigated using X-ray diffraction characterization. The X-ray diffraction (XRD) data show that TiAlN coatings were crystallized in the cubic NaCl B1 structure, with orientations in the {l_brace}1 1 1{r_brace}, {l_brace}2 0 0{r_brace} {l_brace}2 2 0{r_brace} and {l_brace}3 1 1{r_brace} crystallographic planes. The surface morphology (roughness and grain size) of TiAlN coatings was investigated by atomic force microscopy (AFM). By increasing the substrate bias voltage from -40 to -150 V, hardness decreased from 32 GPa to 19 GPa. Scratch tester was used for measuring the critical loads and for measuring the adhesion.

  11. Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering

    Indian Academy of Sciences (India)

    Harish C Barshilia; K S Rajam

    2003-02-01

    Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (), was controlled by controlling the dwell time of the substrate underneath Ti and Cr targets. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the films. The XRD data showed 1st and 2nd order satellite reflections along the principal reflection for films having 132 Å $\\geq \\Lambda \\geq$ 84 Å, thus confirming the formation of superlattice. The multilayer coatings exhibited hardness () as high as 3200 kg/mm2, which is 2 times the rule-of-mixtures value (i.e. $H_{TiN}$ = 2200 kg/mm2 and $H_{CrN}$ = 1000 kg/mm2). Detailed investigations on the effects of various process parameters indicated that hardness of the superlattice coatings was affected not only by modulation wavelength but also by nitrogen partial pressure and ion bombardment during deposition.

  12. Microstructural and magnetic properties of thick ({>=}10 {mu}m) magnetron sputtered barium ferrite films

    Energy Technology Data Exchange (ETDEWEB)

    Dehlinger, A.S. [Universite de Lyon, Institut des Nanotechnologies de Lyon INL-UMR 5270, CNRS, INSA Lyon, Villeurbanne F-69621 (France); Le Berre, M., E-mail: martine.leberre@insa-lyon.f [Universite de Lyon, Institut des Nanotechnologies de Lyon INL-UMR 5270, CNRS, INSA Lyon, Villeurbanne F-69621 (France); Canut, B. [Universite de Lyon, Institut des Nanotechnologies de Lyon INL-UMR 5270, CNRS, INSA Lyon, Villeurbanne F-69621 (France); Chatelon, J.P. [DIOM, Universite Jean Monnet, Saint Etienne F-42023 (France); Albertini, D. [Universite de Lyon, Institut des Nanotechnologies de Lyon INL-UMR 5270, CNRS, INSA Lyon, Villeurbanne F-69621 (France); Perrot, S. [RADIALL, Voiron F-38500 (France); Givord, D. [Institut Louis Neel, UPR 5051, Grenoble F-38042 (France); Rousseau, J.J. [DIOM, Universite Jean Monnet, Saint Etienne F-42023 (France)

    2010-11-15

    This work focuses on the properties of 10-15 {mu}m thick barium M-type hexaferrite (BaFe{sub 12}O{sub 19} or BaM) films deposited by non-reactive RF magnetron sputtering on alumina substrates. High deposition rates were achieved through deposition at room temperature and operation at an RF power of 100 W. By varying sputtering gas pressure, the dc magnetic properties were correlated with structural, morphological and compositional properties obtained by X-ray diffraction (XRD), atomic force microscopy (AFM) and Rutherford backscattering spectrometry (RBS), respectively. A deposition pressure of P=3 Pa enables one to reach the best compromise between high deposition rate (0.75 {mu}m/h) and adequate crystallographic, stoichiometric and magnetostatic properties. Finally the gyromagnetic properties at high frequency were assessed through the characterization of coplanar isolator up to 60 GHz. As such, hexaferrite films prepared using this technique may offer opportunities for the next generation of self-biased planar microwave devices.

  13. Synthesis of Tantalum-Doped Tin Oxide Thin Films by Magnetron Sputtering for Photovoltaic Applications

    Science.gov (United States)

    Nguyen, Ngoc Minh; Luu, Manh Quynh; Nguyen, Minh Hieu; Nguyen, Duy Thien; Bui, Van Diep; Truong, Thanh Tu; Pham, Van Thanh; Nguyen-Tran, Thuat

    2017-06-01

    Tantalum-doped tin oxide transparent conductive thin films were deposited on glass substrates by radio frequency and direct current reactive magnetron co-sputtering methods in an argon and oxygen environment. Optimization of the thin films for photovoltaic applications was performed using a dimensionless figure of merit by combining electrical and transparency properties. The optimized thin film showed a weight-averaged transmittance of 83%, a band gap value of 3.2 eV, resistivity of 5.2 × 10-3 Ω cm, and bulk carrier concentration of 1.2 × 1020 cm-3. The lowest resistivity among all films was 2.1 × 10-3 Ω cm, corresponding to a weight-averaged transmittance of 62%. The optimized deposition condition was carried out by co-sputtering on heated substrates at 270°C. Thin films deposited under this optimized condition were applied for our perovskite solar cells, and demonstrated promising power conversion efficiency.

  14. Characteristics of HT-LiCoO2 cathode films synthesized by Rf magnetron sputtering

    Science.gov (United States)

    Kumar, P. Jeevan; Babu, K. Jayanth; Hussain, O. M.

    2012-06-01

    Polycrystalline HT-LiCoO2 films were successfully synthesized by rf magnetron sputtering. The films were characterized by the studying their phase, structure, and morphology using ex-situ measurements of X-ray diffractometry (XRD), Raman Spectroscopy, Atomic force micrometry (AFM). Electrochemical performance evaluation indicated that the as grown LiCoO2 films The anodic electrochemical performances of the films have been evaluated by cyclic voltammetry (CV) at a scan rate of 0.5 mV/s and by galvanostatic cycling, with lithium metal as the counter and the reference electrode, and cycled in the range of 3.0 - 4.2 V at a current density of 50 μA/cm2. The films show a discharge capacity at the 20th cycle of 58 μAh cm-2μm- Keywords: LiCoO which exhibited excellent capacity retention with a small capacity fade which exhibited excellent capacity retention with a small capacity fade.

  15. Deposition of Visible Light Active Photocatalytic Bismuth Molybdate Thin Films by Reactive Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Marina Ratova

    2016-01-01

    Full Text Available Bismuth molybdate thin films were deposited by reactive magnetron co-sputtering from two metallic targets in an argon/oxygen atmosphere, reportedly for the first time. Energy dispersive X-ray spectroscopy (EDX analysis showed that the ratio of bismuth to molybdenum in the coatings can be effectively controlled by varying the power applied to each target. Deposited coatings were annealed in air at 673 K for 30 min. The crystalline structure was assessed by means of Raman spectroscopy and X-ray diffraction (XRD. Oxidation state information was obtained by X-ray photoelectron spectroscopy (XPS. Photodegradation of organic dyes methylene blue and rhodamine B was used for evaluation of the photocatalytic properties of the coatings under a visible light source. The photocatalytic properties of the deposited coatings were then compared to a sample of commercial titanium dioxide-based photocatalytic product. The repeatability of the dye degradation reactions and photocatalytic coating reusability are discussed. It was found that coatings with a Bi:Mo ratio of approximately 2:1 exhibited the highest photocatalytic activity of the coatings studied; its efficacy in dye photodegradation significantly outperformed a sample of commercial photocatalytic coating.

  16. Magnetron sputtering synthesis of large area well-ordered boron nanowire arrays

    Institute of Scientific and Technical Information of China (English)

    CAO; Limin; ZHANG; Ze; WANG; Wenkui

    2004-01-01

    One-dimensionally nanostructured materials, such as nanowires and nanotubes, are the smallest dimensional structures for efficient transport of electrons and excitons, and are therefore critical building blocks for nanoscale electronic and mechanical devices. In this paper, boron nanowires with uniform diameters from 20 to 80nm were synthesized by radio-frequency magnetron sputtering of pure boron powder and B2O3 powder mixtures in argon atmosphere. The boron nanowires produced stand vertically on the substrate surface to form well-ordered arrays over large areas with selforganized arrangements without involvement of any template and patterned catalyst. The high-density boron nanowires are parallel to each other and well distributed, forming highly ordered and uniform arrays. A more interesting and unique feature of the boron nanowires is that most of their tips are flat rather than hemispherical in morphologies.Detailed studies on its structure and composition indicate that boron nanowires are amorphous. Boron nanowire appears as a new member in the family of one-dimensional nanostructures. Considering the unique properties of boron-rich solids and other nanostructures, it is reasonable to expect that the boron nanowires will display some exceptional and interesting properties. A vapor-cluster-solid (VCS) mechanism was proposed to explain the growth of boron nanowires based on our experimental observations.

  17. Aluminium-induced crystallization of amorphous silicon films deposited by DC magnetron sputtering on glasses

    Energy Technology Data Exchange (ETDEWEB)

    Kezzoula, F., E-mail: kezzoula@usa.com [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria); Laboratory of Materials, Mineral and Composite (LMMC), Boumerdes University (Algeria); Hammouda, A. [UPR CNRS 3079 CEMHTI - 1D Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2 (France); Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Universite d' Orleans, 45067 Orleans Cedex 2 (France); Kechouane, M. [Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Simon, P. [UPR CNRS 3079 CEMHTI - 1D Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2 (France); Universite d' Orleans, 45067 Orleans Cedex 2 (France); Abaidia, S.E.H. [Laboratory of Materials, Mineral and Composite (LMMC), Boumerdes University (Algeria); Keffous, A. [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria); Cherfi, R. [Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Menari, H.; Manseri, A. [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria)

    2011-09-15

    Amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) films were deposited by DC magnetron sputtering technique with argon and hydrogen plasma mixture on Al deposited by thermal evaporation on glass substrates. The a-Si/Al and a-Si:H/Al thin films were annealed at different temperatures ranging from 250 to 550 deg. C during 4 h in vacuum-sealed bulb. The effects of annealing temperature on optical, structural and morphological properties of as-grown as well as the vacuum-annealed a-Si/Al and a-Si:H/Al thin films are presented in this contribution. The averaged transmittance of a-Si:H/Al film increases upon increasing the annealing temperature. XRD measurements clearly evidence that crystallization is initiated at 450 deg. C. The number and intensity of diffraction peaks appearing in the diffraction patterns are more important in a-Si:H/Al than that in a-Si/Al layers. Results show that a-Si:H films deposited on Al/glass crystallize above 450 deg. C and present better crystallization than the a-Si layers. The presence of hydrogen induces an improvement of structural properties of poly-Si prepared by aluminium-induced crystallization (AIC).

  18. Property modulation of NiO films grown by radio frequency magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Chen, T.F.; Wang, A.J.; Shang, B.Y. [Department of Physics, Beijing Normal University, Beijing 100875 (China); Wu, Z.L.; Li, Y.L. [Analytical and Testing Center, Beijing Normal University, Beijing 100875 (China); Wang, Y.S., E-mail: yswang@bnu.edu.cn [Department of Physics, Beijing Normal University, Beijing 100875 (China)

    2015-09-15

    Highlights: • Controllable and preferential growth of NiO films were performed successfully on Si substrates. • Oxygen partial pressure lower than 6% is crucial for transformation of the preferential growth. • The film deposition rate is very sensitive to the low oxygen partial pressure. • NiO lattice expands quadratically with the increasing of oxygen partial pressures. • The films contain high concentration of Ni vacancies and show a good rectifying behavior with p-Si. - Abstract: NiO films were grown on Si substrates by radio frequency magnetron sputtering. The films were analyzed by an X-ray diffractometer, scanning electron microscope, X-ray photoelectron spectroscopy and SCS-4200 semiconductor characterization system. Evolution of the growth mode, lattice strain, morphology, chemistry states and electrical properties were investigated systematically. The film deposition rates and properties are very sensitive to the oxygen partial pressure lower than 10%. It is crucial to decrease the oxygen partial pressure to 2% for (1 1 1) film growth and the films would transform from (1 1 1) to (1 0 0) as the oxygen partial pressure increases from 2% to 6%. The film lattice expands quadratically with the increase of oxygen partial pressure. Nickel vacancy concentration in (1 1 1) films is much higher than that in (1 0 0) films. All (1 0 0) films show good rectifying behavior with p-Si. The film growth modes and properties could be modulated flexibly by controlling the oxygen partial pressures.

  19. Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    YANG Bing-chu; LIU Xiao-yan; GAO Fei; MA Xue-long

    2008-01-01

    ZnO thin films were prepared by direct current(DC) reactive magnetron sputtering under different oxygen partial pressures.And then the samples were annealed in vacuum at 450 ℃. The effects of the oxygen partial pressures and the treatment of annealing in vacuum on the photoluminescence and the concentration of six intrinsic defects in ZnO thin films such as oxygen vacancy(Vo),zinc vacancy(VZn), antisite oxygen(OZn), antisite zinc(ZnO), interstitial oxygen(Oi) and interstitial zinc(Zni) were studied. The results show that a green photoluminescence peak at 520 nm can be observed in all the samples, whose intensity increases with increasing oxygen partial pressure; for the sample annealed in vacuum, the intensity of the green peak increases as well. The green photoluminescence peak observed in ZnO may be attributed to zinc vacancy, which probably originates from transitions between electrons in the conduction band and zinc vacancy levels, or from transitions between electrons in zinc vacancy levels and up valence band.

  20. Natural fiber composites with EMI shielding function fabricated using VARTM and Cu film magnetron sputtering

    Science.gov (United States)

    Xia, Changlei; Ren, Han; Shi, Sheldon Q.; Zhang, Hualiang; Cheng, Jiangtao; Cai, Liping; Chen, Kathleen; Tan, Hwa-Shen

    2016-01-01

    To fabricate kenaf fiber composites with electromagnetic interference (EMI) shielding function, the technique of vacuum-assisted resin transfer molding (VARTM) and Cu film magnetron sputtering were employed. The EMI shielding effectiveness (SE) and composite surface characteristics were examined with PNA Network Analyzer, Quanta 200 environmental scanning electron microscope and OCA20 contact angle meter. After being Cu-sputter coated for 0.5 h, 1 h, 2 h, and 3 h, the EMI SE values were increased to be 23.8 dB, 32.5 dB, 43.3 dB, and 48.3 dB, which denoted 99.5799%, 99.9437%, 99.9953%, or 99.9985% incident signal was blocked, respectively. The SEM observations revealed that the smoother surface of the composites was obtained by longer time sputtering, resulting in the SE improvement. The contact angle increased from 49.6° to 129.5° after 0.5 h sputtering, which indicated that the coated Cu film dramatically improved the hydrophobic property of composite. When the coating time increased to 3 h, the contact angle decreased to 51.0° because the composite surface roughness decreased with the increase in coating time.

  1. Study on ZnO:Al (ZAO) films by DC reaction magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    裴志亮; 孙超; 谭明晖; 关德慧; 肖金泉; 黄荣芳; 闻立时

    2001-01-01

    The high quality ZnO: A1 films were successfully produced by DC reaction magnetron sputtering technology. The Al-doping effect on electrical and optical properties and its scattering mechanism are discussed in detail. The analyses of X-ray diffractometer (XRD), X-ray photoelectron spectroscopy(XPS) and high resolution Auger electron spectroscopy (AES) show that Al2O3 could be effectively removed by controlling oxygen flow and Al-doping concentration during deposition of ZnO: Al films. Zn, Al and oxygen elements are well distributed through the films. For highly degenerated ZnO:A1 semi-conductive thin films, the theoretical and experimental results reveal that the ionized impurity. scattering dominates the Hall mobility in the films in the low-temperature range, while the lattice vibration scattering becomes a major scattering mechanism in the high-temperature range. The grain boundary scattering only plays a major role in the ZAO films with small grain size (as compared to the electron mean free path). The photoelectric properties of ZAO films show that it has low resistivity ( ~ 5 × 10-4 Ωcm), and the transmittance in visible range and the reflectance in IR region are above 80% and 60%, respectively.

  2. Fractal features of CdTe thin films grown by RF magnetron sputtering

    Science.gov (United States)

    Hosseinpanahi, Fayegh; Raoufi, Davood; Ranjbarghanei, Khadijeh; Karimi, Bayan; Babaei, Reza; Hasani, Ebrahim

    2015-12-01

    Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30 W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases.

  3. Structure and electronic properties of SiC thin-films deposited by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHOU Ji-cheng; ZHENG Xu-qiang

    2007-01-01

    SiC thin-films were prepared by RF-magnetron sputtering technique(RMS) with the target of single crystalline SiC and then annealed. The surface morphology of thin-films was characterized by AFM. The result shows that the surface of the thin-films is smooth and compact; XRD analysis reveals that the thin-films are amorphous. The thickness, square-resistance and curves of resistance-temperature were measured. The results show that the curves of lnR versus 1/kT both before and after annealing satisfy the expression of lnR∝△W/kT, where △W is electron excitation energy in the range of 0.014 2-0.018 5 eV, and it has a trend of increasing when the temperature is increased. After synthetical analysis we get the conclusion that the electronic mechanism of the thin-films is short distance transition between the localized states in the temperature range of 25-250 ℃. The resistivity is in the range of 2.4×10-3-4.4×10-3 Ω·cm and it has the same trend as electron excitation energy when annealing temperature is increased, which further confirms the electronic mechanism of thin-films and the trend of electron excitation energy versus annealing temperature.

  4. Effect of amorphous C films deposited by RF magnetron sputtering on smoothing K9 glass substrate

    Science.gov (United States)

    Deng, Songwen; Qi, Hongji; Wei, Chaoyang; Yi, Kui; Fan, Zhengxiu; Shao, Jianda

    2009-12-01

    Soft X-ray multilayer reflectors must be deposited on super-smooth surface such as super-polished silicon wafers or glasses, which are complicate, time-consuming and expensive to produce. To overcome this shortage, C films deposited by RF magnetron sputtering were considered to smooth the K9 glass substrates' surface in the present paper. The structure of C films was systematically studied by XRD and Raman spectrum. The surface morphology and rms-roughness were obtained by AFM. Then, we calculated the impact of the C layers on the reflectivity curve of Mo/Si soft X-ray multilayer reflector around 13.5 nm. The C films exhibit typical amorphous state. With the increasing of power and thickness, the content of sp3 hybrid bonding decreases while the amount or size of well-organized graphite clusters increases. The surface rms-roughness decreases from 2.4 nm to 0.62 nm after smoothed by an 80 nm thick C layer deposited in 500 W, which is the smoothest C layer surface we have obtained. The calculation results show that the theoretical normal incidence reflectivity of Mo/Si multilayer at 13.5 nm increases from 7% to 63%.

  5. RF-Magnetron Sputtered Conductive Perovskite BaPbO3 Films

    Science.gov (United States)

    Luo, Yih-Rong; Wu, Jenn-Ming

    2003-01-01

    The crystallinity, chemical bonding, and electrical properties of BaPbO3 (BPO) thin films prepared by rf-magnetron sputtering on SiO2/Si substrates were investigated. The working pressure and the Ar/O2 ratio during sputtering are two of the most important factors that influence the characteristics of the prepared BPO films. Both increasing working pressure and increasing Ar/O2 ratio enhanced the crystallization of the perovskite BPO phase and yielded films with low resistivity. Sputtering in an environment with a working pressure of 80 mTorr and Ar/O2 = 90/10 at 350°C gave deposited BPO films with a low resistivity of 0.9 × 10-3 Ωcm, and a high carrier concentration of 8.3 × 1020 electrons/cm3, which values were almost equal to those of the bulk BaPbO3. X-ray photoelectron spectroscopy (XPS) revealed that Pb4+ ions were formed in the BPO films as the working pressure and the Ar/O2 ratio were increased, enhancing the crystallization of the perovskite BPO phase to yield films of lower resistivity.

  6. Superior biofunctionality of dental implant fixtures uniformly coated with durable bioglass films by magnetron sputtering.

    Science.gov (United States)

    Popa, A C; Stan, G E; Enculescu, M; Tanase, C; Tulyaganov, D U; Ferreira, J M F

    2015-11-01

    Bioactive glasses are currently considered the suitable candidates to stir the quest for a new generation of osseous implants with superior biological/functional performance. In congruence with this vision, this contribution aims to introduce a reliable technological recipe for coating fairly complex 3D-shaped implants (e.g. dental screws) with uniform and mechanical resistant bioactive glass films by the radio-frequency magnetron sputtering method. The mechanical reliability of the bioactive glass films applied to real Ti dental implant fixtures has been evaluated by a procedure comprised of "cold" implantation in pig mandibular bone from a dead animal, followed by immediate tension-free extraction tests. The effects of the complex mechanical strains occurring during implantation were analysed by scanning electron microscopy coupled with electron dispersive spectroscopy. Extensive biocompatibility assays (MTS, immunofluorescence, Western blot) revealed that the bioactive glass films stimulated strong cellular adhesion and proliferation of human dental pulp stem cells, without promoting their differentiation. The ability of the implant coatings to conserve a healthy stem cell pool is promising to further endorse the fabrication of new osseointegration implant designs with extended lifetime.

  7. Photoelectric properties of ITO thin films deposited by DC magnetron sputtering*

    Institute of Scientific and Technical Information of China (English)

    Liu Wei; Cheng Shuying

    2011-01-01

    As anti-reflecting thin films and transparent electrodes of solar cells, indium tin oxide (ITO) thin films were prepared on glass substrates by DC magnetron sputtering process. The main sputtering conditions were sputtering power, substrate temperature and work pressure. The influence of the above sputtering conditions on the transmittance and conductivity of the deposited ITO films was investigated. The experimental results show that,the transmittance and the resistivity decrease as the sputtering power increases from 30 to 90 W. When the substrate temperature increases from 25 to 150 ℃, the transmittance increases slightly whereas the resistivity decreases. As the work pressure increases from 0.4 to 2.0 Pa, the transmittance decreases and the resistivity increases. When the sputtering power, substrate temperature and work pressure are 30 W, 150 ℃, 0.4 Pa respectively, the ITO thin films exhibit good electrical and optical properties, with resistivity below 10-4 Ω.cm and the transmittance in the visible wave band beyond 80%. Therefore, the ITO thin films are suitable as transparent electrodes of solar cells.

  8. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field.

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  9. Three-Dimensional, Fibrous Lithium Iron Phosphate Structures Deposited by Magnetron Sputtering.

    Science.gov (United States)

    Bünting, Aiko; Uhlenbruck, Sven; Sebold, Doris; Buchkremer, H P; Vaßen, R

    2015-10-14

    Crystalline, three-dimensional (3D) structured lithium iron phosphate (LiFePO4) thin films with additional carbon are fabricated by a radio frequency (RF) magnetron-sputtering process in a single step. The 3D structured thin films are obtained at deposition temperatures of 600 °C and deposition times longer than 60 min by using a conventional sputtering setup. In contrast to glancing angle deposition (GLAD) techniques, no tilting of the substrate is required. Thin films are characterized by X-ray diffraction (XRD), Raman spectrospcopy, scanning electron microscopy (SEM), cyclic voltammetry (CV), and galvanostatic charging and discharging. The structured LiFePO4+C thin films consist of fibers that grow perpendicular to the substrate surface. The fibers have diameters up to 500 nm and crystallize in the desired olivine structure. The 3D structured thin films have superior electrochemical properties compared with dense two-dimensional (2D) LiFePO4 thin films and are, hence, very promising for application in 3D microbatteries.

  10. Formation Mechanism of Fe Nanocubes by Magnetron Sputtering Inert Gas Condensation.

    Science.gov (United States)

    Zhao, Junlei; Baibuz, Ekaterina; Vernieres, Jerome; Grammatikopoulos, Panagiotis; Jansson, Ville; Nagel, Morten; Steinhauer, Stephan; Sowwan, Mukhles; Kuronen, Antti; Nordlund, Kai; Djurabekova, Flyura

    2016-04-26

    In this work, we study the formation mechanisms of iron nanoparticles (Fe NPs) grown by magnetron sputtering inert gas condensation and emphasize the decisive kinetics effects that give rise specifically to cubic morphologies. Our experimental results, as well as computer simulations carried out by two different methods, indicate that the cubic shape of Fe NPs is explained by basic differences in the kinetic growth modes of {100} and {110} surfaces rather than surface formation energetics. Both our experimental and theoretical investigations show that the final shape is defined by the combination of the condensation temperature and the rate of atomic deposition onto the growing nanocluster. We, thus, construct a comprehensive deposition rate-temperature diagram of Fe NP shapes and develop an analytical model that predicts the temporal evolution of these properties. Combining the shape diagram and the analytical model, morphological control of Fe NPs during formation is feasible; as such, our method proposes a roadmap for experimentalists to engineer NPs of desired shapes for targeted applications.

  11. Target voltage behaviour of a vanadium-oxide thin film during reactive magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Wang Tao; Jiang Ya-Dong; Yu He; Wu Zhi-Ming; Zhao He-Nan

    2011-01-01

    This paper simulates reactive magnetron-sputtering in constant current mode in a Vanadium-O2/Ar system equipped with a DC power supply by adopting both kinetics model and Berg's model. The target voltage during the reactive sputtering has been investigated as a function of reactive gas flow. Both experiments and simulations demonstrate a hysteresis curve with respect to the oxygen supply. The time-dependent variation of the target mode is studied by measuring the target voltage for various reactive oxygen gas flows and pre-sputtering times. The presputtering time increases with the increased initial target voltage. Furthermore, a corresponding time-dependent model simulating target voltage changes is also proposed. Based on these simulations, we find some relationships between the discharge voltage behaviour and the properties of the formed oxide. In this way, a better understanding of the target voltage changes during reactive sputtering can be achieved. We conclude that the presented theoretical models for parameter-dependent case and time-dependent case are in qualitative agreement with the experimental results and can be used to comprehend the target voltage behaviour in the deposition of vanadium oxide thin films.

  12. RF magnetron sputtering deposition of CdTe passivation on HgCdTe

    Science.gov (United States)

    Rutkowski, Jaroslaw; Adamiec, Krzysztof; Rogalski, Antoni

    1998-04-01

    In this study, we report the RF magnetron sputtering growth and characterization of CdTe passivant on bulk n-type HgCdTe. Our investigations include the HgCdTe surface preparation and in-situ pretreatment, deposition-induced surface damage, interface charge, CdTe film stoichiometry, and thermal stability. The metal-insulator-semiconductor test structures are processed and their electrical properties are measured by capacitance-voltage characteristics. The heterostructures are also characterized by reflectance measurement. In order to investigate the passivation properties of CdTe/HgCdTe heterostructures, we have modeled the band diagram of abrupt CdTe/HgCdTe heterojunction. The effect of sputtering growth condition parameters is also reported. The sputtering CdTe layers, exhibit excellent dielectric, insulating and mechano- chemical properties, as well as interface properties. The interfaces are characterized by slight accumulation and a small hysteresis. A carefully controlled growth process and surface pretreatment tailored to the specific material are required in order to obtain near flat band conditions on n- type materials. Additional informations on surface limitations are obtained from analyzing the I-V characteristics of photodiodes with metal gates covering the p-n junction surface location.

  13. CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors

    KAUST Repository

    Wei, Binbin

    2016-12-29

    Supercapacitors have been becoming indispensable energy storage devices in micro-electromechanical systems and have been widely studied over the past few decades. Transition metal nitrides with excellent electrical conductivity and superior cycling stability are promising candidates as supercapacitor electrode materials. In this work, we report the fabrication of CrN thin films using reactive DC magnetron sputtering and further their applications for symmetric supercapacitors for the first time. The CrN thin film electrodes fabricated under the deposition pressure of 3.5 Pa show an areal specific capacitance of 12.8 mF cm at 1.0 mA cm and high cycling stability with 92.1% capacitance retention after 20 000 cycles in a 0.5 M HSO electrolyte. Furthermore, our developed CrN//CrN symmetric supercapacitor can deliver a high energy density of 8.2 mW h cm at the power density of 0.7 W cm along with outstanding cycling stability. Thus, the CrN thin films have great potential for application in supercapacitors and other energy storage systems.

  14. Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

    Science.gov (United States)

    Akbarnejad, E.; Ghorannevis, Z.; Abbasi, F.; Ghoranneviss, M.

    2016-12-01

    Cadmium sulfide (CdS) thin films are deposited on the fluorine doped tin oxide coated glass substrate using the radio frequency magnetron sputtering setup. The effects of annealing in air on the structural, morphological, and optical properties of CdS thin film are studied. Optimal annealing temperature is investigated by annealing the CdS thin film at different annealing temperatures of 300, 400, and 500 °C. Thin films of CdS are characterized by X-ray diffractometer analysis, field emission scanning electron microscopy, atomic force microscopy, UV-Vis-NIR spectrophotometer and four point probe. The as-grown CdS films are found to be polycrystalline in nature with a mixture of cubic and hexagonal phases. By increasing the annealing temperature to 500 °C, CdS film showed cubic phase, indicating the phase transition of CdS. It is found from physical characterizations that the heat treatment in air increased the mean grain size, the transmission, and the surface roughness of the CdS thin film, which are desired to the application in solar cells as a window layer material.

  15. Preparation of Indium Tin Oxide Films on Polycarbonate substrates by Radio-frequency Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    LIU Jing; GONG Jian; GU Zhen'an

    2005-01-01

    Indium tin oxide ( ITO ) thin films ( 100 ± 10 nm) were deposited on PC ( polycarbonate ) and glass substrates by rf( radio-frequency ) magnetron sputtering. The oxygen content of the ITO films was changed by variation of the sputtering gas composition. All the other deposition parameters were kept constant. The sheet resistance, optical transmittance and microstructure of ITO films were investigated using a four-point probe, spectrophotometer, X- ray diffractometer( XRD ) and atomic force microscope ( AFM ). Sheet resistances for the ITO films with optical transmittance more than 75% on PC substrates varied from 40 Ω/ cm2 to more than 104 Ω/cm2 with increasing oxygen partial pressure from 0 to about 2% . The same tendency of sheet resistances increasing with increasing oxygen partial pressure was observed on glass substrates. The X-ray diffraction data indicated polycrystalline films with grain orientations predominantly along (440) and (422) directions. The intensities of (440) and (422) peaks increased slightly with the increase of oxygen partial pressure both on PC and glass substrates. The AFM images show that the ITO films on PC substrates were dense and uniform. The average grain size of the films was about 40nm.

  16. Preparation and Corrosion Resistance of Magnesium Coatings by Magnetron Sputtering Deposition

    Institute of Scientific and Technical Information of China (English)

    Hongwei HUO; Ying LI; Fuhui WANG

    2003-01-01

    Magnesium coatings were fabricated on stainless steel substrates (1Cr11Ni2W2MoV) by a plane magnetron sputteringtechnique. The argon pressure and the substrate condition (including temperature and the substrate was rotated orfixed) were varied in order to evaluate the influence of the parameters on the crystal orientation and morphology of thecoating. The corrosion behavior of the coatings in 1 wt pct NaCl solution was studied by electrochemical methods.The results showed that all coatings exhibited preferred orientation (002) as the argon pressure increased from 0.2 to0.4 Pa. The morphologies of the coatings varied with the argon pressure and with whether the substrate was rotatedor fixed. The open circuit potential of the coatings was more positive than that of cast AZ91D magnesium alloy.However, the immersion test in 1 wt pct NaCl solution showed that the corrosion rates of the coatings were higherthan that of cast AZ91D magnesium alloy.

  17. Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Meng, Liang; Szott, Matthew M.; McLain, Jake T.; Ruzic, David N. [Center for Plasma-Materials Interactions, Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States); Yu, He [Center for Plasma-Materials Interactions, Department of Nuclear, Plasma, and Radiological Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States); State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054 (China)

    2014-06-14

    Downstream plasma transport and ionization processes in a high-powered pulsed-plasma magnetron were studied. The temporal evolution and spatial distribution of electron density (n{sub e}) and temperature (T{sub e}) were characterized with a 3D scanning triple Langmuir probe. Plasma expanded from the racetrack region into the downstream region, where a high n{sub e} peak was formed some time into the pulse-off period. The expansion speed and directionality towards the substrate increased with a stronger magnetic field (B), largely as a consequence of a larger potential drop in the bulk plasma region during a relatively slower sheath formation. The fraction of Cu ions in the deposition flux was measured on the substrate using a gridded energy analyzer. It increased with higher pulse voltage. With increased B field from 200 to 800 Gauss above racetrack, n{sub e} increased but the Cu ion fraction decreased from 42% to 16%. A comprehensive model was built, including the diffusion of as-sputtered Cu flux, the Cu ionization in the entire plasma region using the mapped n{sub e} and T{sub e} data, and ion extraction efficiency based on the measured plasma potential (V{sub p}) distribution. The calculations matched the measurements and indicated the main causes of lower Cu ion fractions in stronger B fields to be the lower T{sub e} and inefficient ion extraction in a larger pre-sheath potential.

  18. Structure-Diffusion Relationship of Magnetron-Sputtered WTi Barriers Used in Indium Interconnections

    Science.gov (United States)

    Le Priol, A.; Le Bourhis, E.; Renault, P.-O.; Muller, P.; Sik, H.

    2013-11-01

    Tungsten-titanium (WTi) thin films are known as potential adhesion promoters and diffusion barriers. The barrier efficiency of WTi thin films against indium (In) diffusion was experimentally studied by x-ray diffraction (XRD) measurements during in situ annealing. Specific multilayered samples were designed to estimate the diffusion barrier properties using the Ni/In system. These diffusion samples were made up of a 100-nm-thick WTi layer prepared by magnetron sputtering from an alloyed target (W:Ti ≈ 70:30 at.%), sandwiched between Ni and Au/In layers. WTi film microstructures were observed to depend on the working pressure. Diffusion barrier breakdown was monitored upon annealing by the formation of intermetallic compounds (IMC) (intermixing between Ni and In). Annealing was performed at temperatures of 573 K, 623 K, and 673 K (homologous temperatures T/T_m^In ˜eq 1.34, 1.45, and 1.57, respectively) and under primary vacuum. The diffusion coefficients of In in WTi were determined. The correlation between WTi film microstructure and diffusion barrier efficiency was established. Better diffusion barrier performance was obtained for WTi films with dense microstructure associated with a compressive residual stress state. Hence, tuning the sputtering conditions allows significant improvement of barrier performance against diffusion through a change of the film microstructure.

  19. Properties of Al-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Cu3N and AlxCu3N films were prepared with reactive magnetron sputtering method. The two films were deposited on glass substrates at 0.8 Pa N2 partial pressure and 100 ℃ substrate temperature by using a pure Cu and Al target, respectively. X-ray diffraction (XRD) measurements show that the un-doped film was composed of Cu3N crystallites with anti-ReO3 structure and adopted [111] preferred orientation. XRD shows that the growth of Al-doped copper nitride films (AlxCu3N) was affected strongly by doping Al, the intensity of [111] peak decreases with increasing the concentration of Al and the high concentration of Al could prevent the Cu3N from crystallization. AFM shows that the surface of AlxCu3N film is smoother than that of Cu3N film. Compared with the Cu3N films, the resistivities of the Al-doped copper nitride films (AlxCu3N) have been reduced, and the microhardness has been enhanced.

  20. Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ehiasarian, Arutiun P; Andersson, Joakim; Anders, Andr& #233

    2010-04-18

    The plasma composition of high power impulse magnetron sputtering (HIPIMS) has been studied for titanium and chromium targets using a combined energy analyser and quadrupole mass spectrometer. Measurements were done at distances from 50 to 300 mm from the sputtering target. Ti and Cr are similar in atomic mass but have significantly different sputter yields, which gives interesting clues on the effect of the target on plasma generation and transport of atoms. The Ti and Cr HIPIMS plasmas operated at a peak target current density of ~;;0.5 A cm-2. The measurements of the argon and metal ion content as well as the ion energy distribution functions showed that (1) singly and doubly charged ions were found for argon as well as for the target metal, (2) the majority of ions were singly charged argon for both metals at all distances investigated, (3) the Cr ion density was maintained to distances further from the target than Ti. Gas rarefaction was identified as a main factor promoting transport of metal ions, with the stronger effect observed for Cr, the material with higher sputter yield. Cr ions were found to displace a significant portion of the gas ions, whereas this was less evident in the Ti case. The observations indicate that the presence of metal vapour promotes charge exchange and reduces the electron temperature and thereby practically prevents the production of Ar2+ ions near the target. The content of higher charge states of metal ions depends on the probability of charge exchange with argon.

  1. Thermoelectric properties of Al-doped Mg2Si thin films deposited by magnetron sputtering

    Science.gov (United States)

    Chen, Zhi-jian; Zhou, Bai-yang; Li, Jian-xin; Wen, Cui-lian

    2016-11-01

    The Al-doped Mg2Si thin films were fabricated by two-target alternative magnetron sputtering technique, and the influences of different Al doping contents on the thermoelectric properties of Al-doped Mg2Si thin films were investigated. The compositions, crystal structures, electronic transport properties and thermoelectric properties of the thin films were examined using energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), Hall coefficient measurement and Seebeck coefficient measurement system, respectively. The EDS results show that the thin films doped with Al target sputtering power of 30 W, 60 W and 90 W have the Al content of 0.68 at.%, 1.56 at.% and 2.85 at.%, respectively. XRD results indicate that the diffraction peaks of Mg2Si become stronger with increasing Al dopant. The results of Hall coefficient measurement and Seebeck coefficient measurement system reveal that all the samples are n-type. The conductivities of Al-doped Mg2Si thin films are significantly greater than that of undoped Mg2Si thin film, and increase with increasing Al doping content. With the increase of temperature, the absolute value of the Seebeck coefficients of Mg2Si base thin films increase firstly and then decrease. The maximum power factor obtained is 3.8 mW m-1 k-2 for 1.56 at.% Al-doped Mg2Si thin film at 573 K.

  2. Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

    CERN Document Server

    Wang, Jie; Xu, Yan-Hui; Wei, Wei; Fan, Le; Pei, Xiang-Tao; Hong, Yuan-Zhi; Wang, Yong

    2015-01-01

    TiZrV film is mainly applied in the ultra-high vacuum pipe of storage ring. Thin film coatings of palladium which was added onto the TiZrV film to increase the service life of nonevaporable getters and enhance pumping speed for H2, was deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd film were about 0.42~1.3 nm and 8.5~18.25 nm respectively. It was found that the roughness of TiZrV films was small, about 2~4 nm, for Pd film it is large, about 17~19 nm. PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.

  3. Structural and optical properties of zinc selenide thin films deposited by rf magnetron sputtering

    Science.gov (United States)

    Rizzo, Antonella; Caneve, Luisa; Scaglione, Salvatore; Tagliente, M. A.

    1999-09-01

    In this work, ZnSe thin films were deposited by radio frequency magnetron sputtering onto oriented silicon substrates. Three sets of samples were produced by varying the argon working gas pressure, and changing the sputtering power supply. The effect of the different growth conditions on the structural and optical properties of the ZnSe films was investigated by using XRD and FTIR spectroscopy. In particular, x-ray diffraction was used in order to study the residual strains and texture. The ZnSe coatings were grown in the cubic polymorph with the grains preferentially oriented for all the investigated pressures with the exception of 0.5 Pa. An in-plane residual stress reversal, which changed from compressive to tensile by going from the low to the high-pressure sample set, was observed. At the 0.5 Pa pressure, the ZnSe coatings were both in compressive and tensile state, according to the power supply value. These result have been correlated with the momentum of reflected neutral in order to find an exhaustive description of the deposition process. At low momentum values, the ZnSe films show tensile state, low refractive index, grains preferentially oriented, while at high momentum they were in compressive state, refractive index very alike to the bulk and grains randomly oriented.

  4. Application of RF magnetron sputtering for growth of AZO on glass substrate

    Science.gov (United States)

    Ghorannevis, Z.; Akbarnejad, E.; Salar Elahi, A.; Ghoranneviss, M.

    2016-08-01

    Aluminum zinc oxide (AZO), as one of the most promising transparent conducting oxide (TCO) materials, has now been widely used in thin film solar cells. In this study the optimization process of the RF magnetron sputtered AZO films was performed at room temperature by studying its physical properties such as structural, optical, electrical and morphological at different deposition times (10, 20, 40 and 60 min) for its use as a front contact for the Cadmium Telluride (CdTe) based thin film solar cell applications. Influence of the deposition time was investigated on the physical properties of the AZO thin film by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), spectrophotometer and four point probes. XRD analysis suggests that the preferred orientation of grains for all the samples prepared at different growth times are along (002) plane having the hexagonal structure. From optical measurements the films show an average transmission over 60%. Moreover it was found that by increasing the growth time, which implies increasing the film thicknesses as well as improving the crystallinity the resistivity of the grown films decrease from the 10-2 Ωcm to the order of 10-3 Ωcm.

  5. Effects of Various RF Powers on CdTe Thin Film Growth Using RF Magnetron Sputtering

    Science.gov (United States)

    Alibakhshi, Mohammad; Ghorannevis, Zohreh

    2016-09-01

    Cadmium telluride (CdTe) film was deposited using the magnetron sputtering system onto a glass substrate at various deposition times and radio frequency (RF) powers. Ar gas was used to generate plasma to sputter the CdTe atoms from CdTe target. Effects of two experimental parameters of deposition time and RF power were investigated on the physical properties of the CdTe films. X-ray Diffraction (XRD) analysis showed that the films exhibited polycrystalline nature of CdTe structure with the (111) orientation as the most prominent peak. Optimum condition to grow the CdTe film was obtained and it was found that increasing the deposition time and RF power increases the crystallinity of the films. From the profilometer and XRD data's, the thicknesses and crystal sizes of the CdTe films increased at the higher RF power and the longer deposition time, which results in affecting the band gap as well. From atomic force microscopy (AFM) analysis we found that roughnesses of the films depend on the deposition time and is independent of the RF power.

  6. Optical properties of hexagonal boron nitride thin films deposited by radio frequency bias magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Deng Jin-Xiang; Zhang Xiao-Kang; Yao Qian; Wang Xu-Yang; Chen Guang-Hua; He De-Yan

    2009-01-01

    The optical properties of hexagonal boron nitride (h-BN) thin films were studied in this paper. The films were characterized by Fourier transform infrared spectroscopy,UV-visible transmittance and reflection spectra,h-BN thin films with a wide optical band gap Eg (5.86 eV for the as-deposited film and 5.97 eV for the annealed film) approaching h-BN single crystal were successfully prepared by radio frequency (RF) bias magnetron sputtering and post-deposition annealing at 970 K. The optical absorption behaviour of h-BN films accords with the typical optical absorption characteristics of amorphous materials when fitting is made by the Urbach tail model. The annealed film shows satisfactory structure stability. However,high temperature still has a significant effect on the optical absorption properties,refractive index n,and optical conductivity σ of h-BN thin films. The blue-shift of the optical absorption edge and the increase of Eg probably result from stress relaxation in the film under high temperatures. In addition,it is found that the refractive index clearly exhibits different trends in the visible and ultraviolet regions. Previous calculational results of optical conductivity of h-BN films are confirmed in our experimental results.

  7. Corrosion resistance of CrN thin films produced by dc magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ruden, A. [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al Magdalena, Manizales (Colombia); Laboratorio de Recubrimientos Duros y Aplicaciones Industriales–RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Departamento de matemáticas, Universidad Tecnológica de Pereira, Pereira (Colombia); Restrepo-Parra, E., E-mail: erestrepopa@unal.edu.co [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al Magdalena, Manizales (Colombia); Paladines, A.U.; Sequeda, F. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales–RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia)

    2013-04-01

    In this study, the electrochemical behavior of chromium nitride (CrN) coatings deposited on two steel substrates, AISI 304 and AISI 1440, was investigated. The CrN coatings were prepared using a reactive d.c. magnetron sputtering deposition technique at two different pressures (P1 = 0.4 Pa and P2 = 4 Pa) with a mixture of N{sub 2}–Ar (1.5-10). The microstructure and crystallinity of the CrN coatings were investigated using X-ray diffraction. The aqueous corrosion behavior of the coatings was evaluated using two methods. The polarization resistance (Tafel curves) and electrochemical impedance spectra (EIS) in a saline (3.5% NaCl solution) environment were measured in terms of the open-circuit potentials and polarization resistance (R{sub p}). The results indicated that the CrN coatings present better corrosion resistance and R{sub p} values than do the uncoated steel substrates, especially for the coatings produced on the AISI 304 substrates, which exhibited a strong enhancement in the corrosion resistance. Furthermore, better behavior was observed for the coatings produced at lower pressures (0.4 Pa) than those grown at 4 Pa.

  8. Modeling of RF Magnetron Plasma in N2 with dielectric target

    Science.gov (United States)

    Arbeltier, Steven; Revel, Adrien; Sabary, Frédéric; Secouard, Christophe; Minea, Tiberiu

    2016-09-01

    Thin film batteries technology requires a solid electrolyte suitable for its operation. One option is to use LiPON deposited from Li3PO4 target by radio frequency magnetron sputtering in nitrogen plasma. Despite the successful implementation of this technology, the processes occurring into the plasma and at the substrate during deposition need to be well understood. Modelling is an interesting approach to study the undergoing phenomena such as the quantification of plasma species, the potential evolution in the reactor, the shape of the racetrack and the trajectories of sputtered species. The present results are obtained from two models, (i) a 0D model which describes the plasma kinetic and (ii) a 2D model assuming the axial symmetry. The latter uses a Particle-In-Cell Monte-Carlo approach and self-consistently describes the plasma creation and charged particles trajectories in the reactor. The geometry and the magnetic field correspond to a real CEA-LETI reactor .The dielectric target is 6'' diameter. Radiofrequency polarization of the target is taken into account in the model. Results on the evolution of ions density in plasma, the electric-field and the self-bias on the target, are discussed.

  9. Time-Dependent 2D Modeling of Magnetron Plasma Torch in Turbulent Flow

    Institute of Scientific and Technical Information of China (English)

    LI Lincun; XIA Weidong

    2008-01-01

    A theoretical model is presented to describe the electromagnetic, heat transfer and fluid flow phenomena within a magnetron plasma torch and in the resultant plume, by using a commercial computational fluid dynamics (CFD) code FLUENT. Specific calculations are pre-sented for a pure argon system (i.e., an argon plasma discharging into an argon environment), operated in a turbulent mode. An important finding of this work is that the external axial mag-netic field (AMF) may have a significant effect on the behavior of arc plasma and thus affects the resulting plume. The AMF impels the plasma to retract axially and expand radially. As a result, the plasma intensity distribution on the cross section of torch seems to be more uniform. Numerical results also show that with AMF, the highest plasma temperature decreases and the anode arc root moves upstream significantly, while the current density distribution at the anode is more concentrated with a higher peak value. In addition, the use of AMF then induces a strong backflow at the torch spout and its magnitude increases with the AMF strength but decreases with the inlet gas velocity.

  10. Synthesis of Tantalum-Doped Tin Oxide Thin Films by Magnetron Sputtering for Photovoltaic Applications

    Science.gov (United States)

    Nguyen, Ngoc Minh; Luu, Manh Quynh; Nguyen, Minh Hieu; Nguyen, Duy Thien; Bui, Van Diep; Truong, Thanh Tu; Pham, Van Thanh; Nguyen-Tran, Thuat

    2017-01-01

    Tantalum-doped tin oxide transparent conductive thin films were deposited on glass substrates by radio frequency and direct current reactive magnetron co-sputtering methods in an argon and oxygen environment. Optimization of the thin films for photovoltaic applications was performed using a dimensionless figure of merit by combining electrical and transparency properties. The optimized thin film showed a weight-averaged transmittance of 83%, a band gap value of 3.2 eV, resistivity of 5.2 × 10-3 Ω cm, and bulk carrier concentration of 1.2 × 1020 cm-3. The lowest resistivity among all films was 2.1 × 10-3 Ω cm, corresponding to a weight-averaged transmittance of 62%. The optimized deposition condition was carried out by co-sputtering on heated substrates at 270°C. Thin films deposited under this optimized condition were applied for our perovskite solar cells, and demonstrated promising power conversion efficiency.

  11. Osteoblast proliferation on hydroxyapatite thin coatings produced by right angle magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Mello, A [Instituto Militar de Engenharia, IME, Rio de Janeiro, 22290-270, RJ (Brazil); Hong, Z [Department of Physics and Astronomy, Northwestern University, Evanston, IL 60208 (United States); Rossi, A M [Centro Brasileiro de Pesquisas FIsicas, Rua Dr. Xavier Sigaud, 150, Rio de Janeiro, 22290-180, RJ (Brazil); Luan, L [Department of Physics and Astronomy, Northwestern University, Evanston, IL 60208 (United States); Farina, M [Instituto de Ciencias Biomedicas, Universidade Federal do Rio de Janeiro, Ilha do Fundao, Rio de Janeiro, RJ, 21941-590 (Brazil); Querido, W [Instituto de Ciencias Biomedicas, Universidade Federal do Rio de Janeiro, Ilha do Fundao, Rio de Janeiro, RJ, 21941-590 (Brazil); Eon, J [Inst. QuImica, PUC/RJ, Rio de Janeiro, 21941-590, RJ (Brazil); Terra, J [Centro Brasileiro de Pesquisas FIsicas, Rua Dr. Xavier Sigaud, 150, Rio de Janeiro, 22290-180, RJ (Brazil); Balasundaram, G [Division of Engineering, Brown University, Providence, RI, 02912 (United States); Webster, T [Division of Engineering, Brown University, Providence, RI, 02912 (United States); Feinerman, A [Department of Electrical and Computer Engineering, University of Illinois, Chicago, IL, 60612 (United States); Ellis, D E [Department of Physics and Astronomy, Northwestern University, Evanston, IL 60208 (United States); Ketterson, J B [Department of Physics and Astronomy, Northwestern University, Evanston, IL 60208 (United States); Ferreira, C L [Instituto Militar de Engenharia, IME, Rio de Janeiro, 22290-270, RJ (Brazil)

    2007-06-01

    Right angle magnetron sputtering (RAMS) was used to produce hydroxyapatite (HA) film coatings on pure titanium substrates and oriented silicon wafer (Si(0 0 1)) substrates with flat surfaces as well as engineered surfaces having different forms. Analyses using synchrotron XRD, AFM, XPS, FTIR and SEM with EDS showed that as-sputtered thin coatings consist of highly crystalline hydroxyapatite. The HA coatings induced calcium phosphate precipitation when immersed in simulated body fluid, suggesting in vivo bioactive behavior. In vitro experiments, using murine osteoblasts, showed that cells rapidly adhere, spread and proliferate over the thin coating surface, while simultaneously generating strong in-plane stresses, as observed on SEM images. Human osteoblasts were seeded at a density of 2500 cells cm{sup -2} on silicon and titanium HA coated substrates by RAMS. Uncoated glass was used as a reference substrate for further counting of cells. The highest proliferation of human osteoblasts was achieved on HA RAMS-coated titanium substrates. These experiments demonstrate that RAMS is a promising coating technique for biomedical applications.

  12. Characteristics of ZnO/diamond thin films prepared by RF magnetron sputtering

    CERN Document Server

    Park, Y W; Lee, J G; Baik, Y J; Kim, H J; Jung, H J; Choi, W K; Cho, B H; Park, C Y

    1999-01-01

    Due to its high Young's modulus, diamond has the highest acoustic wave velocity among all materials and is expected to be a candidate substrate for high-frequency surface acoustic wave(SAW) devices. In this study, the deposition of ZnO, as a piezoelectric layer, on a diamond substrate is investigated. ZnO has been fabricated by using RF magnetron sputtering with a ZnO target and various Ar/O sub 2 gas ratios, RF powers, and substrate temperatures at a vacuum of 10 sup - sup 5 Torr. The sputtered ZnO films are characterized by X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS), and I-V characteristics. All the films show only a (002) orientation. The atomic concentration of the sputtered ZnO films is changed by the oxygen gas ratio, and the ZnO films are grown with a homogeneous composition over their entire thickness. The electrical resistivity of the films varied from 4x10 sup 3 to 7x10 sup 8 OMEGA cm, depending on the Ar/O sub 2 gas ratio. The phase...

  13. Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

    CERN Document Server

    Li, T Q; Tsuji, Y; Ohsawa, T; Komiyama, H

    2002-01-01

    The initial growth and texture formation mechanism of titanium nitride (TiN) films were investigated by depositing TiN films on (111) silicon substrates by using reactive magnetron sputtering of a Ti metallic target under a N sub 2 /Ar atmosphere, and then analyzing the films in detail by using transmission electron microscopy (TEM) and x-ray diffraction (XRD). Two power sources for the sputtering, dc and rf, were compared. At the initial growth stage, a continuous amorphous film containing randomly oriented nuclei was observed when the film thickness was about 3 nm. The nuclei grew and formed a polycrystalline layer when the film thickness was about 6 nm. As the film grew further, its orientation changed depending on the deposition conditions. For dc sputtering, the appearance of (111) or (200)-preferred orientations depended on the N sub 2 partial pressure, and the intensity of the preferred orientation increased with increasing film thickness. For rf sputtering, however, when the film thickness was small (...

  14. Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films.

    Science.gov (United States)

    Peng, Jichang; Li, Wenbin; Huang, Qiushi; Wang, Zhanshan

    2016-08-12

    The microstructure evolution of magnetron-sputtered Ni/C multilayers was investigated by varying the Ni and C layer thickness in the region of a few nanometers. For the samples having 2.6-nm-thick C layers, the interface width increases from 0.37 to 0.81 nm as the Ni layer thickness decreases from 4.3 to 1.3 nm. Especially for the samples with Ni layers less than 2.0 nm, the interface width changes significantly due to the discontinuously distributed Ni crystallites. For the samples having 2.8-nm-thick Ni layers, the interface width increases from 0.37 to 0.59 nm when the C layer thickness decreases from 4.3 to 0.7 nm. The evolution of interface microstructures with varied Ni and C layers is explained based on a proposed simple growth model of Ni and C layers.

  15. Surface morphology of titanium nitride thin films synthesized by DC reactive magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Ţǎlu Ştefan

    2015-03-01

    Full Text Available In this paper the influence of temperature on the 3-D surface morphology of titanium nitride (TiN thin films synthesized by DC reactive magnetron sputtering has been analyzed. The 3-D morphology variation of TiN thin films grown on p-type Si (100 wafers was investigated at four different deposition temperatures (473 K, 573 K, 673 K, 773 K in order to evaluate the relation among the 3-D micro-textured surfaces. The 3-D surface morphology of TiN thin films was characterized by means of atomic force microscopy (AFM and fractal analysis applied to the AFM data. The 3-D surface morphology revealed the fractal geometry of TiN thin films at nanometer scale. The global scale properties of 3-D surface geometry were quantitatively estimated using the fractal dimensions D, determined by the morphological envelopes method. The fractal dimension D increased with the substrate temperature variation from 2.36 (at 473 K to 2.66 (at 673 K and then decreased to 2.33 (at 773 K. The fractal analysis in correlation with the averaged power spectral density (surface yielded better quantitative results of morphological changes in the TiN thin films caused by substrate temperature variations, which were more precise, detailed, coherent and reproducible. It can be inferred that fractal analysis can be easily applied for the investigation of morphology evolution of different film/substrate interface phases obtained using different thin-film technologies.

  16. Structural and mechanical properties of diamond-like carbon films deposited by direct current magnetron sputtering

    Science.gov (United States)

    Broitman, E.; Hellgren, N.; Czigány, Zs.; Twesten, R. D.; Luning, J.; Petrov, I.; Hultman, L.; Holloway, B. C.

    2003-07-01

    The microstructure, morphology, and mechanical properties of diamond-like carbon (DLC) films deposited by direct current magnetron sputtering were investigated for microelectromechanical systems applications. Film properties were found to vary markedly with the ion energy (Eion) and ion-to-carbon flux ratio (Jion/JC). Cross-sectional high-resolution transmission electron microscopy revealed an amorphous microstructure. However, the presence of nanometer-sized domains at Eion~85 eV was detected. Film stresses, σ, which were compressive in all cases, ranged from 0.5 to 3.5 GPa and depended on the flux ratio as well as ion energy. The hardness (H), Young's moduli (ɛ), and elastic recovery (R) increased with Eion to maximum values of H=27 GPa, ɛ=250 GPa, and R=68% at Eion=85 eV and Jion/JC=4.4. However, near edge x-ray absorption fine structure and electron energy-loss spectrum analysis showed that the sp2/sp3 content of the films does not change with Eion or Jion/JC. The measured change in mechanical properties without a corresponding change in sp2/sp3 ratio is not consistent with any previously published models. We suggest that, in the ranges 5 eV <=Eion<=85 eV and 1.1 <=Jion/JC<=6.8, the presence of defective graphite formed by subplanted C and Ar atoms has the dominant influence on the mechanical properties of DLC films.

  17. Reactive magnetron sputtering of CN{sub x} thin films at different substrate bias

    Energy Technology Data Exchange (ETDEWEB)

    Zheng, W.T.; Broitman, E.; Hellgren, N.; Xing, K.Z.; Ivanov, I.; Sjoestroem, H.; Hultman, L.; Sundgren, J.-E. [Linkoeping Univ. (Sweden). Dept. of Physics

    1997-10-31

    The chemical binding states of C and N atoms, and optical properties of carbon nitride (CN{sub x}) thin films deposited by unbalanced magnetron sputtering, have been investigated as a function of the negative substrate bias (V{sub s}). The film deposition rate increased slightly with increasing V{sub s}, having a weak maximum at floating potential (--50 V), and decreased sharply to zero for V{sub s}>150 V, while N/C ratios did not exhibit any significant variation. Raman spectroscopy was used to reveal that the structure of the film is predominantly amorphous. Fourier transform infra-red spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) analyses showed that N atoms in the films were bound to C atoms through sp{sup 2} and sp{sup 3} configurations. Triple C-N bonds were also detected by FTIR. The ratio of sp{sup 3} to sp{sup 2} bonds increased with increasing V{sub s}. The maximum sp{sup 3} concentration in CN{sub x} films was estimated to be --20%. The optical band gap of CN{sub x} films was also found to increase with an increase in V{sub s}. (orig.) 19 refs.

  18. MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING

    Institute of Scientific and Technical Information of China (English)

    J. Lee; W. Gao; Z. Li; M. Hodgson; A. Asadov; J. Metson

    2005-01-01

    ZnO thin films were deposited on a glass substrate by dc (direct current) and rf (radio frequency) magnetron sputtering. Post-deposition annealing was performed in different atmospheres and at different temperatures. The correlation of the annealing conditions with the microstructure and properties of the ZnO films were investigated by ultraviolet-visible spectroscopy, X-ray diffraction, conductivity measurement and scanning electron microscopy. Only the strong 002peak could be observed by X-ray diffraction. The post-deposition annealing of ZnO films was found to alter the film's microstructure and properties, including crystallinity, porosity, grain size, internal stress level and resistivity. It was also found that after annealing, the conductivity of poorly conductive samples often improved. However, annealing does not improve the conductivity of samples with high conductivity prior to annealing. The resistivity of as-grown films annealing on the conductivity of ZnO, it is believed that annealing may alter the presence and distribution of oxygen defects, reduce the lattice stress, cause diffusion, grain coarsening and recrystallization. Annealing will reduce the density of grain boundaries in less dense films,which may decrease the resistivity of the films. On the other hand, annealing may also increase the porosity of thin films, leading to an increase in resistivity.

  19. Dependence of characteristics of LaB6 films on DC magnetron sputtering power

    Institute of Scientific and Technical Information of China (English)

    XU Jing; MIN Guang-hui; HU Li-jie; ZHAO Xiao-hua; YU Hua-shun

    2009-01-01

    Lanthanum hexaboride(LaB6) thin films were deposited on glass substrate by DC magnetron sputtering technology, and the AFM, XRD and scratch tests were used to characterize the deposited films. Influences of sputtering power on the microstructure and the bonding strength between the film and substrate were investigated. AFM observation proves that the dense films are obtained, and the surface roughness is below 4.3 nm. The LaB6 film shows the crystalline structure with the grain less than 100 nm. The XRD pattern identifies that the crystal structure of the films is in accordance with that of bulk LaB6, and the (100) crystal face is dominated. The average grain size decreases firstly and then increases with increasing power, and reaches the minimum of 40 nm when the sputtering power is 44 W. Moreover, the intensity of peaks in XRD pattern increases firstly and decreases afterward with increasing power. When the sputtering power is 50 W, the peak intensity reaches the maximum, showing an intense relationship between the power and crystal structures. The scratch test shows that interface bonding strength of the film/substrate is higher at the power of 44 W than the others, due to the formation of the nanosized crystals and their improved surface energy.

  20. Studies on Magnetron Sputtered ZnO-Ag Films: Adhesion Activity of S. aureus

    Science.gov (United States)

    Geetha, S. R.; Dhivya, P.; Raj, P. Deepak; Sridharan, M.; Princy, S. Adline

    Zinc oxide (ZnO) thin films have been deposited onto thoroughly cleaned stainless steel (AISI SS 304) substrates by reactive direct current (dc) magnetron sputtering and the films were doped with silver (Ag). The prepared thin films were analyzed using X-ray diffraction (XRD), field emission-scanning electron microscopy (FE-SEM) to investigate the structural and morphological properties. The thickness values of the films were in the range of 194 to 256nm. XRD results revealed that the films were crystalline with preferred (002) orientation. Grain size values of pure ZnO films were found to be 19.82-23.72nm. On introducing Ag into ZnO film, the micro-structural properties varied. Adhesion test was carried out with Staphylococcus aureus (S. aureus) in order to know the adherence property of the deposited films. Colony formation units (CFU) were counted manually and bacterial adhesion inhibition (BAI) was calculated. We observed a decrease in the CFU on doping Ag in the ZnO films. BAI of the film deposited at - 100 V substrate bias was found to be increased on Ag doping from 69 to 88%.

  1. Thermal evolution of Er silicate thin films grown by rf magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lo Savio, R; Miritello, M; Piro, A M; Grimaldi, M G; Priolo, F [MATIS CNR-INFM and Dipartimento di Fisica e Astronomia dell' Universita di Catania, via Santa Sofia 64, 95123 Catania (Italy); Iacona, F [CNR-IMM, Stradale Primosole 50, 95121 Catania (Italy)], E-mail: roberto.losavio@ct.infn.it

    2008-11-12

    Stoichiometric Er silicate thin films, monosilicate (Er{sub 2}SiO{sub 5}) and disilicate (Er{sub 2}Si{sub 2}O{sub 7}), have been grown on c-Si substrates by rf magnetron sputtering. The influence of annealing temperature in the range 1000-1200 deg. C in oxidizing ambient (O{sub 2}) on the structural and optical properties has been studied. In spite of the known reactivity of rare earth silicates towards silicon, Rutherford backscattering spectrometry shows that undesired chemical reactions between the film and the substrate can be strongly limited by using rapid thermal treatments. Monosilicate and disilicate films crystallize at 1100 and 1200 deg. C, respectively, as shown by x-ray diffraction analysis; the crystalline structures have been identified in both cases. Moreover, photoluminescence (PL) measurements have demonstrated that the highest PL intensity is obtained for Er{sub 2}Si{sub 2}O{sub 7} film annealed at 1200 deg. C. In fact, this treatment allows us to reduce the defect density in the film, in particular by saturating oxygen vacancies, as also confirmed by the increase of the lifetime of the PL signal.

  2. Boron-rich plasma by high power impulse magnetron sputtering of lanthanum hexaboride

    Energy Technology Data Exchange (ETDEWEB)

    Oks, Efim M. [State University of Control Systems and Radioelectronics, Tomsk (Russian Federation); Anders, Andre [Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

    2012-10-15

    Boron-rich plasmas have been obtained using a LaB{sub 6} target in a high power impulse sputtering (HiPIMS) system. The presence of {sup 10}B{sup +}, {sup 11}B{sup +}, Ar{sup 2+}, Ar{sup +}, La{sup 2+}, and La{sup +} and traces of La{sup 3+}, {sup 12}C{sup +}, {sup 14}N{sup +}, and {sup 16}O{sup +} have been detected using an integrated mass and energy spectrometer. Peak currents as low as 20 A were sufficient to obtain plasma dominated by {sup 11}B{sup +} from a 5 cm planar magnetron. The ion energy distribution function for boron exhibits an energetic tail extending over several 10 eV, while argon shows a pronounced peak at low energy (some eV). This is in agreement with models that consider sputtering (B, La) and gas supply (from background and 'recycling'). Strong voltage oscillations develop at high current, greatly affecting power dissipation and plasma properties.

  3. Characterization of AZO and Ag based films prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Miao, Dagang [Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong (China); Jiang, Shouxiang, E-mail: kinor.j@polyu.edu.hk [Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong (China); Zhao, Hongmei [Department of Prosthodontics, The Affiliated Hospital of Qingdao University, Qingdao (China); Shang, Songmin; Chen, Zhuoming [Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong (China)

    2014-12-15

    Highlights: • Highly infrared reflective AZO and Ag based films were prepared. • Ag showed better crystallization on AZO film than on glass substrate. • Infrared reflection rate was inversely proportional to the film sheet resistance. • Film with infrared reflection of 97% in FIR region was acquired. - Abstract: Ag, AZO/Ag, Ag/AZO and AZO/Ag/AZO films were prepared on glass substrates by radio frequency (RF) magnetron sputtering technology. The prepared films were systematically investigated by X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), UV–visible spectrophotometer, a four-point probe system and Fourier Transform Infrared Spectroscopy. The results indicated that Ag inner layer starts forming a continuous film at the thickness of 10 nm and Ag layer presents superior crystallization on AZO substrate than that on glass substrate. The continuous Ag inner layer film provided the highest average visible transmittance of 85.4% (AZO/Ag/AZO). The lowest sheet resistance of 3.21 Ω/sq and the highest infrared reflection rate of 97% in FIR region can be obtained on AZO/Ag (15 nm)/AZO film. The high infrared reflection property of the AZO/Ag/AZO coating makes it a promising candidate for solar control films.

  4. Rapidly switched wettability of titania films deposited by dc magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Shirolkar, Mandar; Abyaneh, Majid Kazemian; Singh, Akanksha; Kulkarni, Sulabha [DST Unit on Nanoscience, Department of Physics, University of Pune (India); Tomer, Anju; Choudhary, Ram; Sathe, Vasant; Phase, Deodatta [UGC-DAE Consortium for Scientific Research Indore Centre, University Campus, Khandwa Road, Indore (India)], E-mail: skk@physics.unipune.ernet.in

    2008-08-07

    Rapid switching (5-15 minutes) in the wettability of titania (TiO{sub 2}) thin films in the anatase phase has been observed after UV irradiation. The film surface becomes superhydrophilic when exposed to UV radiation. The relationship between wettability, thickness and crystallinity of TiO{sub 2} films has been investigated. Amorphous and anatase TiO{sub 2} thin films have been deposited by varying the argon to oxygen gas ratio, using the reactive dc magnetron sputtering technique. It was found that the gas ratio primarily affects thickness, crystallinity, morphology and wettability of the films. The highest contact angle that has been reported so far, namely, 170 deg. -176 deg., has been observed for film thickness varying from 112-500 nm in the case of pristine anatase TiO{sub 2} films. On the other hand, amorphous films show a variation in the contact angle from 120 deg. to 140 deg. as the thickness varied from 70 to 145 nm. The deposition is extremely robust and has an ultralow hysteresis in the contact angle. The films exhibit a morphology similar to the lotus leaf and the water hyacinth.

  5. Preparation and properties of erbium oxide films deposited by radio frequency magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Yanping [China Academy of Engineering Physics, Mianyang 621900, Sichuan Province (China); Zhu, Shengfa, E-mail: zhushf-306@163.com [China Academy of Engineering Physics, Mianyang 621900, Sichuan Province (China); Liu, Tianwei; Li, Fangfang; Zhang, Yanzhi [China Academy of Engineering Physics, Mianyang 621900, Sichuan Province (China); Rao, Yongchu; Zhang, Yongbin [Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621907, Sichuan Province (China)

    2014-07-01

    The erbium oxide (Er{sub 2}O{sub 3}) film is considered as a candidate for tritium permeation barrier in recent years because of its low permeation reduced ratio and easy accessibility. Erbium oxide films with different thickness were prepared by radio frequency magnetron sputtering with varying substrate temperature and sputtering time. The film surface morphology, structure, residual stress and deuterium permeation behavior were investigated. The films were compact and smooth, while the thickness varied from 200 nm to 1000 nm. The (2 2 2) preferential orientation of Er{sub 2}O{sub 3} depressed, when the substrate temperature above 200 °C. With the substrate temperature increasing from RT to 200 °C, the compressive stress became larger, and it converted into tensile stress deposited at 400 °C. The residual stress transformed from tensile to compressive stress as the film got thicker. The permeation flux of the sample deposited with Er{sub 2}O{sub 3} film was 2 orders of magnitude less than that of uncoated one. The permeation reduced factor (PRF) of 0.5-μm Er{sub 2}O{sub 3} film deposited at room temperature is about 300 at 773 K.

  6. Magnetron sputtering deposition of [FePt/Ag]n multilayers for perpendicular recording

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    [FePt/Ag]n multilayers were deposited on glass substrates by RF magnetron sputtering and ex situ annealed at 550℃ for 30 min. The effects of inserted Ag layer thickness and the number of bilayer repetitions (n) on the structure and magnetic properties of the multilayers were investigated. It was found that the difference between in-plane and out-of-plane coercivities varied with an increase of inserted Ag layer thickness in the [FePt 2 nm/Ag x nm]10 multilayers. The ratio of out-of-plane coercivity to in-plane coercivity reached the maximum value with the Ag layer thickness of 5 nm, indicating that the Ag layer thickness plays an important role in obtaining perpendicular orientation. For the [FePt 2 nm/Ag 5 nm]n multilayers, perpendicular orientation is also influenced by n. The maximum value of the ratio of out-of-plane coercivity to in-plane coercivity appeared when n was given as 8. It was found that the [FePt 2 nm/Ag 5 nm]8 had a high perpendicular coercivity of 520 kA/m and a low in-plane one of 88 kA/m, which shows a strong perpendicular anisotropy.

  7. Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    WANG Ji-hui; XIA Yang; E.Wieers; L.M.Stals; J.P.Celis

    2005-01-01

    MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and observed respectively by X-ray diffractometry and scanning electron microscopy. The results show that at lower argon pressures of 0.15Pa and 0.40Pa, MoS2 coatings are formed with the (002) basal plane parallel to the surface, whereas the coating deposited at the argon pressure above 0.60Pa has the (002) basal plane perpendicular to the surface. Two stages can be classified for the formation of MoS2 coating. At the initial stage of coating formation, the (002) basal plane with S-Mo-S layer structure grows on the substrate whatever the argon pressure is. And then the coating under 0.40Pa argon pressure still grows with (002) laminate structure, but the coatings under 0.88Pa and 1.60Pa argon pressures turn to grow with the mixed basal and edge orientations. The morphology and structure of MoS2 coatings are highly related to their growth rate and the energy of sputtered particles.

  8. Magnetron Sputtering a New Fabrication Method of Iron Based Biodegradable Implant Materials

    Directory of Open Access Journals (Sweden)

    Till Jurgeleit

    2015-01-01

    Full Text Available It was shown in the previous decade that pure-iron has a large potential as a biodegradable medical implant material. It is necessary to tailor the material properties according to the intended use of the device. It is of great interest to investigate not only the influence of processing on the material properties but also alternative fabrication methods. In this work for the first time magnetron sputtering in combination with UV lithography was used to fabricate free standing, patterned pure-iron thick films. For the intended use as biodegradable implant material free standing thick films were characterized in terms of microstructure, degradation performance, and mechanical properties before and after various heat treatments. The influence of microstructural changes on the degradation behavior was determined by linear polarization measurements. The mechanical properties were characterized by tensile tests. Microstructure, surface, and composition were investigated by scanning transmission electron microscopy (STEM, energy dispersive X-ray spectroscopy (EDX, and X-ray diffraction (XRD measurements. The foils exhibited a preferential orientation in 110 direction and a fine grained structure. Furthermore they showed a higher strength compared to cast iron and corrosion rates in the range of 0.1 mm/year. Their mechanical properties were tuned by grain coarsening resulting in a slight increase of the degradation rate.

  9. Application of 60 mm/φ superconducting bulk magnet to magnetron sputtering

    Science.gov (United States)

    Matsuda, T.; Kashimoto, S.; Imai, A.; Yanagi, Y.; Itoh, Y.; Ikuta, H.; Mizutani, U.; Sakurai, K.; Hazama, H.

    2003-10-01

    We constructed the planar magnetron sputtering apparatus using a c-axis oriented single-domain Sm123 bulk superconductor with 60 mm in diameter as a very powerful magnet in place of an ordinary Nd-Fe-B magnet. A high magnetic field of 4.2 T at the surface of the superconductor coupled with a high target voltage of maximum 6 kV enabled us to discharge even at pressure of 1 × 10 -3 Pa. A target-to-substrate distance of 300 mm was successfully employed under low pressures of 10 -2-10 -3 Pa to make the deposition of almost contamination-free films feasible. The simulation software (JMAG) was used to optimize the magnetic circuit configurations. The simulations could reproduce well the distribution of the magnetic field above the target measured by a three-axial Hall sensor. The discharging characteristics of Cu, Ni and Fe targets in the pressure range over 10 -1-10 -3 Pa were studied under different target voltages. The deposition rates of 0.063 nm/s (or 38 Å/min) and 0.013 nm/s (or 8 Å/min) were achieved for Cu and Fe targets with 3 mm in thickness, respectively, under the Ar pressure of 6.6 × 10 -2 Pa (or 4.9 × 10 -4 Torr).

  10. Preparation of zinc tin oxide films by reactive magnetron sputtering of Zn on liquid Sn

    Energy Technology Data Exchange (ETDEWEB)

    Pau, J.L., E-mail: joseluis.pau@uam.e [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain); Scheffler, L.; Hernandez, M.J.; Cervera, M.; Piqueras, J. [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain)

    2010-09-30

    Zn is sputter-deposited on melted Sn films by radio-frequency magnetron sputtering in oxidizing plasma. The samples present an absorption cut-off wavelength close to the one of ZnO, and an optical transparency higher than 50% in the visible range. Ex-situ thermal annealing improves visible transparency and produces a slight blue-shift in the optical bandgap. X-ray diffraction patterns show typical spectra due to polycrystalline ZnO with evidence of the presence of crystalline SnO, before annealing, and Zn{sub 2}SnO{sub 4}, after annealing. Rutherford Backscattering studies reveal the existence of a ZnO layer on top of an O-rich (Zn, Sn)O thin film. After optimal thermal treatment, electrical characterization exhibits carrier concentrations of 10{sup 16}-10{sup 17} cm{sup -3} and mobilities of 20-80 cm{sup 2} V{sup -1} s{sup -1} for the resulting (Zn, Sn)O n-type films.

  11. Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering

    Science.gov (United States)

    Merie, Violeta Valentina; Pustan, Marius Sorin; Bîrleanu, Corina; Negrea, Gavril

    2015-05-01

    Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants, etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-micro-electromechanical systems, and so on. This work is a comparative study concerning the influence of substrate temperature on some mechanical and tribological characteristics of titanium nitride thin films. The researched thin films were obtained by the reactive magnetron sputtering method. The experiments employed two kinds of substrates: a steel substrate and a silicon one. The elaboration of titanium nitride thin films was done at two temperatures. First, when the substrates were at room temperature, and second, when the substrates were previously heated at 250°C. The temperature of 250°C was kept constant during the deposition of the films. The samples were then investigated by atomic force microscopy in order to establish their mechanical and tribological properties. The nanohardness, Young's modulus, roughness, and friction force were some of the determined characteristics. The results demonstrated that the substrate which was previously heated at 250°C led to the obtaining of more adherent titanium nitride thin films than the substrate used at room temperature. The preheating of both substrates determined the decrease of thin films roughness. The friction force, nanohardness and Young's modulus of the tested samples increased when the substrates were preheated at 250°C.

  12. Deposition and Characterization of Molybdenum Thin Film Using Direct Current Magnetron and Atomic Force Microscopy

    Directory of Open Access Journals (Sweden)

    Muhtade Mustafa Aqil

    2017-01-01

    Full Text Available In this paper, pure molybdenum (Mo thin film has been deposited on blank Si substrate by DC magnetron sputtering technique. The deposition condition for all samples has not been changed except for the deposition time in order to study the influence of time on the thickness and surface morphology of molybdenum thin film. The surface profiler has been used to measure the surface thickness. Atomic force microscopy technique was employed to investigate the roughness and grain structure of Mo thin film. The thickness and grain of molybdenum thin film layer has been found to increase with respect to time, while the surface roughness decreases. The average roughness, root mean square roughness, surface skewness, and surface kurtosis parameters are used to analyze the surface morphology of Mo thin film. Smooth surface has been observed. From grain analysis, a uniform grain distribution along the surface has been found. The obtained results allowed us to decide the optimal time to deposit molybdenum thin film layer of 20–100 nm thickness and subsequently patterned as electrodes (source/drain in carbon nanotube-channel transistor.

  13. Magnetron Sputtered NbN Films with Nb Interlayer on Mild Steel

    Directory of Open Access Journals (Sweden)

    Kulwant Singh

    2011-01-01

    Full Text Available The aim of the study is to extend the NbN coating on MS with Nb interlayer to explore the benefits of hard nitride coatings on low-cost structural material and to compare the coating with NbN monolithic coating on SS. NbN on MS and SS was deposited by reactive d.c. magnetron sputtering at various N2/Ar flow ratios and substrate bias. Deposition rate decreased from 20 to 10 nm/min (without biasing and from 16 to 8 nm/min (−50 V biasing when N2/Ar ratio was varied from zero to 70%. Deposition rate decreased with the increase in bias voltage. Coatings showed hexagonal β Nb2N, cubic δ NbN, and hexagonal δ′ NbN as major phases with the increasing N2 flow. Surface hardness reached a maximum of 2040 HK25 at a N2/Ar of 20%. Critical loads, for cohesive and adhesive failure for coating on MS, were between 6–8 N and 9–12 N respectively; for coating on SS, the values were between 7–15 N and 12–25 N respectively. Duplex coatings were studied for hardness by Knoop microindentation, adhesion by scratch tester, and corrosion by potentiodynamic polarization technique. Hardness, adhesion, and corrosion resistance all improved when NbN coating was incorporated with Nb interlayer on MS.

  14. Hopping conduction in zirconium oxynitrides thin film deposited by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Guo, Jie; Zhan, Guanghui; Liu, Jingquan, E-mail: jqliu@sjtu.edu.cn; Yang, Bin; Xu, Bin; Feng, Jie; Chen, Xiang; Yang, Chunsheng

    2015-10-15

    Zirconium oxynitrides thin film thermometers were demonstrated to be useful temperature sensors. However, the basic conduction mechanism of zirconium oxynitrides films has been a long-standing issue, which hinders the prediction and optimization of their ultimate performance. In this letter, zirconium oxynitrides films were grown on sapphire substrates by magnetron sputtering and their electric transport mechanism has been systemically investigated. It was found that in high temperatures region (>150 K) the electrical conductivity was dominated by thermal activation for all samples. In the low temperatures range, while Mott variable hopping conduction (VRH) was dominated the transport for films with relatively low resistance, a crossover from Mott VRH conduction to Efros–Shklovskii (ES) VRH was observed for films with relatively high resistance. This low temperature crossover from Mott to ES VRH indicates the presence of a Coulomb gap (~7 meV). These results demonstrate the competing and tunable conduction mechanism in zirconium oxynitrides thin films, which would be helpful for optimizing the performance of zirconium oxynitrides thermometer.

  15. Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films

    Institute of Scientific and Technical Information of China (English)

    DU Xin-kang; WANG Tian-min; WANG Cong; CHEN Bu-liang; ZHOU Long

    2007-01-01

    Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from -50 ℃to 600 ℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase components, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure,δ-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate temperature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the δ-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases.Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to -50 ℃, and a remarkable augmentation of transmittance could be noticed under so low a temperature.

  16. Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering

    Science.gov (United States)

    Kubart, T.; Aijaz, A.

    2017-05-01

    The interaction between pulsed plasmas and surfaces undergoing chemical changes complicates physics of reactive High Power Impulse Magnetron Sputtering (HiPIMS). In this study, we determine the dynamics of formation and removal of a compound on a titanium surface from the evolution of discharge characteristics in an argon atmosphere with nitrogen and oxygen. We show that the time response of a reactive process is dominated by surface processes. The thickness of the compound layer is several nm and its removal by sputtering requires ion fluence in the order of 1016 cm-2, much larger than the ion fluence in a single HiPIMS pulse. Formation of the nitride or oxide layer is significantly slower in HiPIMS than in dc sputtering under identical conditions. Further, we explain very high discharge currents in HiPIMS by the formation of a truly stoichiometric compound during the discharge off-time. The compound has a very high secondary electron emission coefficient and leads to a large increase in the discharge current upon target poisoning.

  17. Post Magnetron Sputter And Reactive Sputter Coating Of Contoured Glass, Acrylic And Polycarbonate Substrates

    Science.gov (United States)

    Wright, Michael P.

    1985-12-01

    A Post Magnetron Sputter concept employing a cylindrical internally cooled target (cathode) is described. The use of an internal, rotating, permanent magnetic field resulting in 360° utilisation of the target material is outlined. Computer controlled horizontal and vertical movement of the cathode assembly facilitates the coating of contoured substrates which may be glass, acrylic or polycarbonate. Deposition of different metals is easily achieved by changing the cathode or covering it with a suitable sheath material. The design of the cathode results in economic utilisation of the target material, which is particularly important when sputtering expensive metals such as gold. In addition to the deposition of metallic films, such as stainless steel or chrome, reactive sputtering may be undertaken by the introduction of a reactive gas into the vacuum chamber. In this way metal oxide, sulphide or nitride layers may be deposited according to the requirements of the layer structure. Specific optically-active oxides such as indium tin oxide are easily deposited in a uniform film and the formation of multilayer coatings for sun protective and heat rejecting applications is practicable. Indeed, a complete process may be undertaken without removing the substrate from the chamber; merely by adding or changing the reactive gas present.

  18. Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering

    Science.gov (United States)

    Zhang, X. X.; Wu, Y. Z.; Mu, B.; Qiao, L.; Li, W. X.; Li, J. J.; Wang, P.

    2017-03-01

    Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen stoichiometry of 2:1 were achieved. The results showed that no phase and microstructure change occurred due to W2N film annealing in vacuum up to 973 K. Heating up to 1073 K led to a partial decomposition of the W2N phase and the formation of a W enrichment layer at the surface. Increasing the annealing time at the same temperature, the further decomposition of the W2N phase was negligible. The complete decomposition of W2N film happened as the temperature reached up to 1473 K.

  19. The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

    Institute of Scientific and Technical Information of China (English)

    王庆; 王永富; 巴德纯; 岳向吉

    2012-01-01

    The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.

  20. Lp-dual Quermassintegral sums

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    In this paper,we first introduce a concept of L_p-dual Quermassintegral sum function of convex bodies and establish the polar projection Minkowski inequality and the polar projection Aleksandrov-Fenchel inequality for L_p-dual Quermassintegral sums.Moreover,by using Lutwak’s width-integral of index i,we establish the L_p-Brunn-Minkowski inequality for the polar mixed projec- tion bodies.As applications,we prove some interrelated results.

  1. Dual pairs in fluid dynamics

    CERN Document Server

    Gay-Balmaz, François

    2010-01-01

    This paper is a rigorous study of the dual pair structure of the ideal fluid and the dual pair structure for the $n$-dimensional Camassa-Holm (EPDiff) equation, including the proofs of the necessary transitivity results. In the case of the ideal fluid, we show that a careful definition of the momentum maps leads naturally to central extensions of diffeomorphism groups such as the group of quantomorphisms and the Ismagilov central extension.

  2. DESIGN OF A DUAL KEYBOARD

    OpenAIRE

    V. Ragavi; G. Geetha

    2013-01-01

    The design of a computer keyboard with dual function is proposed. This computer keyboard called Dual Keyboard can function both as a normal keyboard and as a pressure sensitive keyboard. The proposed device has a switch that decides the function. The keyboard makes use of sensors placed beneath the keys to measure the pressure applied on the key by the user. This device has many applications. In this study, it is applied to mitigate Denial of Service (DoS) attack.

  3. Fast dual tomography

    Science.gov (United States)

    Carrion, Philip M.

    1990-09-01

    This paper can be considered as a continuation of the work by Carrion and Carneiro (1989), where a generalized approach to linearized inversion of geophysical data was developed. Their method allows one to incorporate virtually any constraints in the inversion and reformulate the problem in the dual space of Langrangian multipliers (see also Carrion, 1989a). The constrained tomography makes traveltime inversion robust: it automatically rejects “bad data” which correspond to solutions beyond the chosen constraints and allows one to start inversion with an arbitrary chosen initial model.In this paper, I will derive basic formulas for constrained tomographic imaging that can be used in such areas of geophysics as global mapping of the earth interior, exploration geophysics, etc. The method is fast: an example that will be shown in the paper took only 6 min. of VAX CPU time. Had the conventional least-squares matrix inversion been used it would have taken more than 10 hours of the CPU time to solve the same problem.

  4. Fast dual tomography

    Energy Technology Data Exchange (ETDEWEB)

    Carrion, P.M. (PPPG/UFBA - Campus Universitario da Federacao, Salvador-Bahia (Brazil))

    1990-09-01

    This paper can be considered as a continuation of the work by Carrion and Carneiro (1989), where a generalized approach to linearized inversion of geophysical data was developed. Their method allows one to incorporate virtually any constraints in the inversion and reformulate the problem in the dual space of Langrangian multipliers (see also Carrion, 1989a). The constrained tomography makes traveltime inversion robust: it automatically rejects bad data which correspond to solutions beyond the chosen constraints and allows one to start inversion with an arbitrary chosen initial model. In this paper, the author derives basic formulas for constrained tomographic imaging that can be used in such areas of geophysics as global mapping of the earth interior, exploration geophysics, etc. The method is fast: an example that will be shown in the paper took only 6 min. of VAX CPU time. Had the conventional least-squares matrix inversion been used it would have taken more than 10 hours of the CPU time to solve the same problem.

  5. Homogeneous M2 duals

    CERN Document Server

    Figueroa-O'Farrill, José

    2015-01-01

    Motivated by the search for new gravity duals to M2 branes with $N>4$ supersymmetry --- equivalently, M-theory backgrounds with Killing superalgebra $\\mathfrak{osp}(N|4)$ for $N>4$ --- we classify (except for a small gap) homogeneous M-theory backgrounds with symmetry Lie algebra $\\mathfrak{so}(n) \\oplus \\mathfrak{so}(3,2)$ for $n=5,6,7$. We find that there are no new backgrounds with $n=6,7$ but we do find a number of new (to us) backgrounds with $n=5$. All backgrounds are metrically products of the form $\\operatorname{AdS}_4 \\times P^7$, with $P$ riemannian and homogeneous under the action of $\\operatorname{SO}(5)$, or $S^4 \\times Q^7$ with $Q$ lorentzian and homogeneous under the action of $\\operatorname{SO}(3,2)$. At least one of the new backgrounds is supersymmetric (albeit with only $N=2$) and we show that it can be constructed from a supersymmetric Freund--Rubin background via a Wick rotation. Two of the new backgrounds have only been approximated numerically.

  6. In vitro biocompatibility of Ti–Mg alloys fabricated by direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hieda, Junko, E-mail: hieda@imr.tohoku.ac.jp; Niinomi, Mitsuo; Nakai, Masaaki; Cho, Ken

    2015-09-01

    Ti–xMg (x = 17, 33, and 55 mass%) alloy films, which cannot be prepared by conventional melting processes owing to the absence of a solid-solution phase in the phase diagram, were prepared by direct current magnetron sputtering in order to investigate their biocompatibility. Ti and Mg films were also prepared by the same process for comparison. The crystal structures were examined by X-ray diffraction (XRD) analysis and the surfaces were analyzed by X-ray photoelectron spectroscopy. The Ti, Ti–xMg alloy, and Mg films were immersed in a 0.9% NaCl solution at 310 K for 7 d to evaluate the dissolution amounts of Ti and Mg. In addition, to evaluate the formation ability of calcium phosphate in vitro, the Ti, Ti–xMg alloy, and Mg films were immersed in Hanks' solution at 310 K for 30 d. Ti and Mg form solid-solution alloys because the peaks attributed to pure Ti and Mg do not appear in the XRD patterns of any of the Ti–xMg alloy films. The surfaces of the Ti–17Mg alloy and Ti–33Mg alloy films contain Ti oxides and MgO, whereas MgO is the main component of the surface oxide of the Ti–55Mg alloy and Mg films. The dissolution amounts of Ti from all films are below or near the detection limit of inductively coupled plasma-optical emission spectroscopy. On the other hand, the Ti–17Mg alloy, Ti–33Mg alloy, Ti–55Mg alloy, and Mg films exhibit Mg dissolution amounts of approximately 2.5, 1.4, 21, and 41 μg/cm{sup 2}, respectively. The diffraction peaks attributed to calcium phosphate are present in the XRD patterns of the Ti–33Mg alloy, Ti–55Mg alloy, and Mg films after the immersion in Hanks' solution. Spherical calcium phosphate particles precipitate on the surface of the Ti–33Mg film. However, many cracks are observed in the Ti–55Mg film, and delamination of the film occurs after the immersion in Hanks' solution. The Mg film is dissolved in Hanks' solution and calcium phosphate particles precipitate on the glass substrate

  7. Low friction coefficient coatings Ni-Cr by magnetron sputtering, DC

    Directory of Open Access Journals (Sweden)

    Morales-Hernández, Jorge

    2015-09-01

    Full Text Available Magnetron Sputter Deposition technique with DC was used for the deposition of Ni-Cr coatings on AISI 316 SS like substrate. The cathode with a nominal composition Ni-22 at% Cr was prepared by Mechanical Alloying (MA technique, with a maximum milling time of 16 hours and, with a high energy SPEX 8000 mill. The coatings were made under Argon atmosphere at room temperature with a power of 100 W at different times of growth. Chemical composition, microstructure, topography, nanohardness and wear of the coatings were evaluated using the techniques of microanalysis by energy dispersive X-ray analyzer (EDAX, X-Ray Diffraction (XRD, Atomic Force Microscopy (AFM, Nano-indentation and pin-on-Disk, respectively. After milling, was not detected contamination in the mixtures. XRD analysis revealed that the microstructure of the Ni-Cr alloy was maintained in the coatings with respect to MA powders, with some degree of recrystallization. Nanohardness values were in the order of 8.8 GPa with a Young’s modulus of 195 GPa. The adhesion of the films was evaluated according to their resistance to fracture when these were indented at different loads using Vickers microhardness. The wear test results showed a decrease in the friction coefficient with respect to the increase of thickness’ films, getting a minimum value of 0.08 with a thickness of 1 μm and which correspond with the maximum growing time.La técnica de Deposición por Chisporroteo Magnético (Magnetron Sputtering con el proceso DC, fue usado para la deposición de los recubrimientos de Ni-Cr sobre acero inoxidable AISI 316 como sustrato. El cátodo con una composición nominal Ni-22 at% Cr fue preparado por la técnica de Aleado Mecánico (AM, con un tiempo máximo de molienda de 16 horas y con un molino de alta energía tipo SPEX 8000. Las películas se realizaron bajo una atmósfera de argón a temperatura ambiente con una potencia de 100 W a diferentes tiempos de crecimiento. La composición qu

  8. Thermochromic VO2 thin films deposited by magnetron sputtering for smart window applications

    Science.gov (United States)

    Fortier, Jean-Philippe

    "Smart" windows are a perfect innovative example of technology that reduces our energy dependence and our impact on the environment while saving on the economical point of view. With the use of vanadium dioxide (VO2), a thermochromic compound, and this, as a thin coating, it would in fact be possible to control the sun's transmission of infrared light (heat) as a function of the surrounding environment temperature. In other words, its optical behavior would allow a more effective management of heat exchanges between a living venue and the outdoor environment. However, this type of window is still in a developmental stage. First, the oxide's deposition is not simple in nature. Based on a conventional deposition technique called magnetron sputtering mainly used in the fenestration industry, several factors such as the oxygen concentration and the substrate temperature during deposition can affect the coating's thermochromic behavior, and this, by changing its composition and crystallinity. Other control parameters such as the deposition rate, the pressure in the sputtering chamber and the choice of substrate may also modify the film microstructure, thereby varying its optical and electrical properties. In addition, several issues still persist as to its commercial application. For starters, the material's structural transition, related to the change of its optical properties, only occurs around 68°C. In addition, its low transparency and natural greenish colour are not visually appealing. Then, to this day, the deposition temperature required to crystallize and form the thermochromic oxide remains an obstacle for a possible large-scale application. Ultimately, although the material's change in temperature has been shown to be advantageous in situations of varying climate, the existing corrective solutions to these issues generate a deterioration of the thermochromic behavior. With no practical expertise on the material, this project was undertaken with certain

  9. Oxidation of magnetron sputtered La-Si thin films for solide oxide fuel cell electronlytes

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, J.C. [SEG-CEMUC, Mechanical Department, University of Coimbra, Rua Luis Reis Santos, 3030-788 Coimbra (Portugal)], E-mail: joao.oliveira@dem.uc.pt; Horwat, D. [Laboratoire de Science et Genie des Surfaces (UMR 7570), Ecole des Mines, Parc de Saurupt - F 54042 Nancy Cedex (France)], E-mail: david.horwat@mines.inpl-nancy.fr; Billard, A. [Laboratoire d' Etudes et de Recherches sur les Materiaux, les Procedes et les Surfaces, UTBM, Universite de Technologie de Belfort-Montbeliard, 90010 Belfort (France)], E-mail: alain.billard@utbm.fr; Cavaleiro, A. [SEG-CEMUC, Mechanical Department, University of Coimbra, Rua Luis Reis Santos, 3030-788 Coimbra (Portugal)], E-mail: albano.cavaleiro@dem.uc.pt

    2009-01-30

    La-Si thin films were deposited on stainless steel substrates by magnetron sputtering from pure La and Si targets. The Si/(Si + La) atomic ratio in the films was varied from 43.2 to 59.3% by adjusting the discharge current on the La target. The films had a homogeneous chemical composition down to the substrate and sharp interfaces. Annealing the films in air at 1173 K promotes the formation of apatite-structure La{sub 9.33}Si{sub 6}O{sub 26} and the diffusion of different species from the film to the substrate and vice-versa, resulting in broadening the interfaces. X-Ray diffraction showed that all the as-deposited films had an amorphous structure. The formation of the LaSi{sub 2} phase at intermediate temperatures was observed for the films deposited with higher Si contents while the films deposited with lower Si contents remained amorphous up to the start of the apatite structure crystallization process. The lanthanum silicate apatite-like phase (La{sub 9.33}Si{sub 6}O{sub 26}) was obtained only after annealing at 1173 K, excepted for the film with the lower Si content which is already partially crystallized after annealing at 1073 K. Quite pure La{sub 9.33}Si{sub 6}O{sub 26} was obtained only after annealing the film with the highest Si content (Si/(Si + La) = 59.3%) although the theoretical Si/(Si + La) atomic ratio for apatite structure lanthanum silicate is 39%. For the other films, La{sub 2}O{sub 3} was always detected when the lanthanum silicate phase was formed. Both phenomena clearly resulted from the strong diffusion of silicon excess towards the stainless steel substrate.

  10. Chemical and Morphological Characterization of Magnetron Sputtered at Different Bias Voltages Cr-Al-C Coatings

    Directory of Open Access Journals (Sweden)

    Aleksei Obrosov

    2017-02-01

    Full Text Available MAX phases (M = transition metal, A = A-group element, and X = C/N are of special interest because they possess a unique combination of the advantages of both metals and ceramics. Most attention is attracted to the ternary carbide Cr2AlC because of its excellent high-temperature oxidation, as well as hot corrosion resistance. Despite lots of publications, up to now the influence of bias voltage on the chemical bonding structure, surface morphology, and mechanical properties of the film is still not well understood. In the current study, Cr-Al-C films were deposited on silicon wafers (100 and Inconel 718 super alloy by dc magnetron sputtering with different substrate bias voltages and investigated using Scanning Electron Microscopy (SEM, X-ray Photoelectron Spectroscopy (XPS, X-ray Diffraction (XRD, Atomic Force Microscopy (AFM, and nanoindentation. Transmission Electron Microscopy (TEM was used to analyze the correlation between the growth of the films and the coating microstructure. The XPS results confirm the presence of Cr2AlC MAX phase due to a negative shift of 0.6–0.9 eV of the Al2p to pure aluminum carbide peak. The XRD results reveal the presence of Cr2AlC MAX Phase and carbide phases, as well as intermetallic AlCr2. The film thickness decreases from 8.95 to 6.98 µm with increasing bias voltage. The coatings deposited at 90 V exhibit the lowest roughness (33 nm and granular size (76 nm combined with the highest hardness (15.9 GPa. The ratio of Al carbide to carbide-like carbon state changes from 0.12 to 0.22 and correlates with the mechanical properties of the coatings. TEM confirms the columnar structure, with a nanocrystalline substructure, of the films.

  11. A Semi-Empirical Model for Tilted-Gun Planar Magnetron Sputtering Accounting for Chimney Shadowing

    Science.gov (United States)

    Bunn, J. K.; Metting, C. J.; Hattrick-Simpers, J.

    2015-01-01

    Integrated computational materials engineering (ICME) approaches to composition and thickness profiles of sputtered thin-film samples are the key to expediting materials exploration for these materials. Here, an ICME-based semi-empirical approach to modeling the thickness of thin-film samples deposited via magnetron sputtering is developed. Using Yamamura's dimensionless differential angular sputtering yield and a measured deposition rate at a point in space for a single experimental condition, the model predicts the deposition profile from planar DC sputtering sources. The model includes corrections for off-center, tilted gun geometries as well as shadowing effects from gun chimneys used in most state-of-the-art sputtering systems. The modeling algorithm was validated by comparing its results with experimental deposition rates obtained from a sputtering system utilizing sources with a multi-piece chimney assembly that consists of a lower ground shield and a removable gas chimney. Simulations were performed for gun-tilts ranging from 0° to 31.3° from the vertical with and without the gas chimney installed. The results for the predicted and experimental angular dependence of the sputtering deposition rate were found to have an average magnitude of relative error of for a 0°-31.3° gun-tilt range without the gas chimney, and for a 17.7°-31.3° gun-tilt range with the gas chimney. The continuum nature of the model renders this approach reverse-optimizable, providing a rapid tool for assisting in the understanding of the synthesis-composition-property space of novel materials.

  12. Investigation of optical and microstructural properties of RF magnetron sputtered PTFE films for hydrophobic applications

    Energy Technology Data Exchange (ETDEWEB)

    Tripathi, S., E-mail: shilpatr3@gmail.com [Optics and Thin Film Laboratory, Bhabha Atomic Research Centre, Visakhapatnam (India); Haque, S. Maidul; Rao, K. Divakar; De, Rajnarayan [Optics and Thin Film Laboratory, Bhabha Atomic Research Centre, Visakhapatnam (India); Shripathi, T.; Deshpande, U.; Ganesan, V. [UGC-DAE Consortium for Scientific Research, Indore (India); Sahoo, N.K. [Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai (India)

    2016-11-01

    Highlights: • Polytetrafluoroethylene films were made by RF sputtering by varying deposition time. • With increasing deposition time, thickness shows unusual trend due to backsputtering. • Major contribution of CF{sub 2} and CF{sub 3} bonds in the samples is seen by ATR-FTIR. • Deposition time influences film thickness but all samples remain hydrophobic. • XPS spectra show strong CF{sub x} bonds at the surface. - Abstract: The deposition time dependence of optical, structural and morphological properties of thin as well as ultrathin Polytetrafluoroethylene (PTFE) sputtered films have been explored in the present communication. The films were prepared by RF magnetron sputtering under high vacuum condition, as a function of deposition time. The ellipsometry as well as X-ray reflectivity data show a drastic reduction in film thickness as the deposition time increases from 5 s to 10 s, possibly as a consequence of back sputtering. With subsequent deposition, back sputtering component decreases and hence, thickness increases with increase in deposition time. Atomic force microscopy (AFM) images show a slight change in growth morphology although roughness is independent of deposition time. Attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR) measurements showed the presence of C−C and CF{sub x} (x = 1–3) bonds in all the PTFE films. Supporting this, corresponding X-ray photoelectron spectroscopy (XPS) curves fitted for C-1s and F-1s peaks revealed a major contribution from CF{sub 2} bonds along with significant contribution from CF{sub 3} bonds leading to an F/C ratio of ∼1.5 giving hydrophobic nature of all the films.

  13. Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Szymańska, Magdalena, E-mail: magdalena_szymanska@its.waw.pl [Warsaw University of Technology, Institute of Microelectronics and Optoelectronics, Koszykowa 75, 00-662 Warsaw (Poland); Motor Transport Institute, Jagiellońska 80, 03-301 Warsaw (Poland); Gierałtowska, Sylwia; Wachnicki, Łukasz [Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw (Poland); Grobelny, Marcin; Makowska, Katarzyna [Motor Transport Institute, Jagiellońska 80, 03-301 Warsaw (Poland); Mroczyński, Robert [Warsaw University of Technology, Institute of Microelectronics and Optoelectronics, Koszykowa 75, 00-662 Warsaw (Poland)

    2014-05-01

    Highlights: • Structural and electrical characterization of HfO{sub x} and HfO{sub x}N{sub y} thin films. • Analysis of the influence of deposition process parameters on properties of films. • Investigation of the post-deposition annealing on HfO{sub x} and HfO{sub x}N{sub y} properties. • Experiment has been designed with use of Taguchi's orthogonal arrays. • The most favorable annealing temperature of HfO{sub x} and HfO{sub x}N{sub y} is 300 °C. - Abstract: The purpose of this work was to compare the structural and electrical properties of magnetron sputtered hafnium oxide (HfO{sub x}) and hafnium oxynitride (HfO{sub x}N{sub y}) thin films. A careful analysis of the influence of deposition process parameters, among them: pressure in the reactor chamber, Ar and O{sub 2} flow rate, power applied to the reactor chamber and deposition time, on electro-physical properties of HfO{sub x} and HfO{sub x}N{sub y} layers has been performed. In the course of this work we performed number of experiments by means of Taguchi's orthogonal arrays approach. Such a method allowed for the determination of dielectric layers properties depending on process parameters with relatively low amount of experiments. Moreover, the effects of post-deposition annealing on electrical characteristics of metal–insulator–semiconductor (MIS) structures with HfO{sub x} or HfO{sub x}N{sub y} gate dielectric and its structural properties have also been reported. Investigated hafnia thin films were characterized by means of spectroscopic ellipsometry (SE), electrical characteristics measurements, atomic force microscopy (AFM), X-ray diffraction spectroscopy (XRD) and Rutherford backscattering spectrometry (RBS)

  14. Bioactivity response of Ta1-xOx coatings deposited by reactive DC magnetron sputtering.

    Science.gov (United States)

    Almeida Alves, C F; Cavaleiro, A; Carvalho, S

    2016-01-01

    The use of dental implants is sometimes accompanied by failure due to periimplantitis disease and subsequently poor esthetics when soft-hard tissue margin recedes. As a consequence, further research is needed for developing new bioactive surfaces able to enhance the osseous growth. Tantalum (Ta) is a promising material for dental implants since, comparing with titanium (Ti), it is bioactive and has an interesting chemistry which promotes the osseointegration. Another promising approach for implantology is the development of implants with oxidized surfaces since bone progenitor cells interact with the oxide layer forming a diffusion zone due to its ability to bind with calcium which promotes a stronger bond. In the present report Ta-based coatings were deposited by reactive DC magnetron sputtering onto Ti CP substrates in an Ar+O2 atmosphere. In order to assess the osteoconductive response of the studied materials, contact angle and in vitro tests of the samples immersed in Simulated Body Fluid (SBF) were performed. Structural results showed that oxide phases where achieved with larger amounts of oxygen (70 at.% O). More compact and smooth coatings were deposited by increasing the oxygen content. The as-deposited Ta coating presented the most hydrophobic character (100°); with increasing oxygen amount contact angles progressively diminished, down to the lowest measured value, 63°. The higher wettability is also accompanied by an increase on the surface energy. Bioactivity tests demonstrated that highest O-content coating, in good agreement with wettability and surface energy values, showed an increased affinity for apatite adhesion, with higher Ca/P ratio formation, when compared to the bare Ti substrates.

  15. The nanostructure evolution during and after magnetron deposition of Au films

    Energy Technology Data Exchange (ETDEWEB)

    Schell, N.; Jensen, T.; Petersen, J.H.; Andreasen, K.P.; Boettiger, J.; Chevallier, J

    2003-09-22

    The evolution of the nanostructure of magnetron sputtered Au films has been experimentally studied. At a synchrotron-radiation beam line, during growth and subsequent annealing, in-situ X-ray diffraction has been carried out to follow the texture, the grain size, the microstrain and lattice-plane distances. With Bragg-Brentano geometry, only (111) grains, having a (111) plane parallel to the film surface, have been observed, while, with glancing incidence and exit X-ray diffraction, (111)* grains, having one of their (111) planes perpendicular to the film surface, have also been observed. Both during growth and subsequent annealing, the (111) texture changed, and some (111)* grains recrystallized and/or the orientation of the grains changed. The microstrain decreased drastically during the first few minutes of growth (300 A) while, simultaneously, the size of the coherently diffracting domains increased. Subsequently, the microstrain became constant, and the rate of increase of the size of coherently diffracting domains leveled off. Initially, during the first few minutes of annealing, a large decrease in the microstrain was observed simultaneously with a dramatic rise of the size of the coherently diffracting domains. After this initial annealing period, as during film growth, the microstrain became constant, and the rate of increase of the size of coherently diffracting domains leveled off. The activation energy for the initial growth of the coherent diffracting domains was found to be Q=0.25{+-}0.03 eV, and the activation energy for normal grain growth was found to be Q=0.99{+-}0.04 eV. Finally, the thin-film stress was followed during growth and subsequent annealing. A tensile contribution to the stress was observed during island coalescence.

  16. Temperature-dependent wear mechanisms for magnetron-sputtered AlTiTaN hard coatings.

    Science.gov (United States)

    Khetan, Vishal; Valle, Nathalie; Duday, David; Michotte, Claude; Mitterer, Christian; Delplancke-Ogletree, Marie-Paule; Choquet, Patrick

    2014-09-10

    AlTiTaN coatings have been demonstrated to have high thermal stability at temperatures up to 900 °C. It has been speculated that the high oxidation resistance promotes an improved wear resistance, specifically for dry machining applications. This work reports on the influence of temperature up to 900 °C on the wear mechanisms of AlTiTaN hard coatings. DC magnetron-sputtered coatings were obtained from an Al(46)Ti(42)Ta(12) target, keeping the substrate bias at -100 V and the substrate temperature at 265 °C. The coatings exhibited a single-phase face-centered cubic AlTiTaN structure. The dry sliding tests revealed predominant abrasion and tribo-oxidation as wear mechanisms, depending on the wear debris formed. At room temperature, abrasion leading to surface polishing was observed. At 700 and 800 °C, slow tribo-oxidation and an amorphous oxide formed reduced the wear rate of the coating compared to room temperature. Further, an increase in temperature to 900 °C increased the wear rate significantly due to fast tribo-oxidation accompanied by grooving. The friction coefficient was found to decrease with temperature increasing from 700 to 900 °C due to the formation of oxide scales, which reduce adhesion of asperity contacts. A relationship between the oxidation and wear mechanisms was established using X-ray diffraction, Raman spectroscopy, scanning electron microscopy, surface profilometry, confocal microscopy, and dynamic secondary ion mass spectrometry.

  17. Degradation and Characterization of Resorbable Phosphate-Based Glass Thin-Film Coatings Applied by Radio-Frequency Magnetron Sputtering.

    Science.gov (United States)

    Stuart, Bryan W; Gimeno-Fabra, Miquel; Segal, Joel; Ahmed, Ifty; Grant, David M

    2015-12-16

    Quinternary phosphate-based glasses of up to 2.67 μm, deposited by radio-frequency magnetron sputtering, were degraded in distilled water and phosphate-buffered saline (PBS) to investigate their degradation characteristics. Magnetron-sputtered coatings have been structurally compared to their compositionally equivalent melt-quenched bulk glass counterparts. The coatings were found to have structurally variable surfaces to melt-quenched glass such that the respective bridging oxygen to nonbridging oxygen bonds were 34.2% to 65.8% versus 20.5% to 79.5%, forming metaphosphate (PO3)(-) (Q(2)) versus less soluble (P2O7)(4-) (Q(1)) and (PO4)(3-) (Q(0)), respectively. This factor led to highly soluble coatings, exhibiting a t(1/2) degradation dependence in the first 2 h in distilled water, followed by a more characteristic linear profile because the subsequent layers were less soluble. Degradation was observed to preferentially occur, forming voids characteristic of pitting corrosion, which was confirmed by the use of a focused ion beam. Coating degradation in PBS precipitated a (PO3)(-) metaphosphate, an X-ray amorphous layer, which remained adherent to the substrate and seemingly formed a protective diffusion barrier, which inhibited further coating degradation. The implications are that while compositionally similar, sputter-deposited coatings and melt-quenched glasses are structurally dissimilar, most notably, with regard to the surface layer. This factor has been attributed to surface etching of the as-deposited coating layer during deposition and variation in the thermal history between the processes of magnetron sputtering and melt quenching.

  18. Sub microsecond notching of a negative hydrogen beam at low energy utilizing a magnetron ion source with a split extractor

    Energy Technology Data Exchange (ETDEWEB)

    Moehs, Douglas; /Fermilab

    2004-12-01

    A technique for sub-microsecond beam notching is being developed at 20 keV utilizing a Magnetron ion source with a slit extraction system and a split extractor. Each half of the extractor is treated as part of a 50 ohm transmission line which can be pulsed at {+-}700 volts creating a 1400 volt gradient. This system along with the associated electronics is electrically floated on top of a pulsed extraction voltage. A beam reduction of 95% has been observed at the end of the Fermilab 400 MeV Linac and 35% notching has recently been achieved in the Booster.

  19. Preparation of Nano-crystalline Tungsten Carbide Thin Film by Magnetron Sputtering and Their Electrocatalytic Property for PNP Reduction

    Institute of Scientific and Technical Information of China (English)

    Hua Jun ZHENG; Jian Guo HUANG; Chun An MA

    2005-01-01

    Nano-crystalline tungsten carbide thin films were deposited on Ni substrates by magnetron sputtering using WC as target material. The crystal structure and morphology of the thin films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM).Electrochemical investigations showed that the electrode of the thin film exhibited higher electrocatalytic activity in the reaction of p-nitrophenol (PNP) reduction. FT-IR analysis indicated that p-aminophenol (PAP) was synthesized after two step reduction of PNP on nano-crystalline tungsten carbide thin film electrode.

  20. The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Pershyn, Yuriy; Gullikson, Erik; Artyukov, Igor; Kondratenko, Valeriy; Sevryukova, Victoriya; Voronov, Dmitriy; Zubarev, Evgeniy; Vinogradov, Alexander

    2011-08-08

    Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering ({lambda} = 0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.