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Sample records for cdte films deposited

  1. CdTe Films Deposited by Closed-space Sublimation

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    CdTe films are prepared by closed-space sublimation technology. Dependence of film crystalline on substrate materials and substrate temperature is investigated. It is found that films exhibit higher crystallinity at substrate temperature higher than 400℃. And the CdTe films deposited on CdS films with higher crystallinity have bigger crystallite and higher uniformity. Treatment with CdCl2 methanol solution promotes the crystallite growth of CdTe films during annealing.

  2. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    Zulkarnain Zainal

    2012-05-01

    Full Text Available CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111 orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the CdTe film increased with the increase of CdTe concentration. The optical energy band gap of film decreased with the increase of CdTe concentration, and with the increase of isothermal bath temperature. The film thickness increased with respect to the increase of CdTe concentration and bath temperature, and following, the numerical expression for the film thickness with respect to these two variables has been established.

  3. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    OpenAIRE

    Zulkarnain Zainal; Mohd Norizam Md Daud; Azmi Zakaria; Mohd Sabri Mohd Ghazali; Atefeh Jafari; Wan Rafizah Wan Abdullah

    2012-01-01

    CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111) orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the ...

  4. Properties of RF sputtered cadmium telluride (CdTe) thin films: Influence of deposition pressure

    Science.gov (United States)

    Kulkarni, R. R.; Pawbake, A. S.; Waykar, R. G.; Rondiya, S. R.; Jadhavar, A. A.; Pandharkar, S. M.; Karpe, S. D.; Diwate, K. D.; Jadkar, S. R.

    2016-04-01

    Influence of deposition pressure on structural, morphology, electrical and optical properties of CdTe thin films deposited at low substrate temperature (100°C) by RF magnetron sputtering was investigated. The formation of CdTe was confirmed by low angle XRD and Raman spectroscopy. The low angle XRD analysis revealed that the CdTe films have zinc blende (cubic) structure with crystallites having preferred orientation in (111) direction. Raman spectra show the longitudinal optical (LO) phonon mode peak ˜ 165.4 cm-1 suggesting high quality CdTe film were obtained over the entire range of deposition pressure studied. Scanning electron microscopy analysis showed that films are smooth, homogenous, and crack-free with no evidence of voids. The EDAX data revealed that CdTe films deposited at low deposition pressure are high-quality stoichiometric. However, for all deposition pressures, films are rich in Cd relative to Te. The UV-Visible spectroscopy analysis show the blue shift in absorption edge with increasing the deposition pressure while the band gap show decreasing trend. The highest electrical conductivity was obtained for the film deposited at deposition pressure 1 Pa which indicates that the optimized deposition pressure for our sputtering unit is 1 Pa. Based on the experimental results, these CdTe films can be useful for the application in the flexible solar cells and other opto-electronic devices.

  5. Induced Recrystallization of CdTe Thin Films Deposited by Close-Spaced Sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Levi, D. H.; Kazmerski, L. L. (National Renewable Energy Laboratory); Mayo, B. (Southern University and A& M College, Baton Rouge, LA)

    1998-10-26

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl2 treatment at 350 C and completely recrystallized after the same treatment at 400 C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl2 are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  6. Comparative study of CdTe sources used for deposition of CdTe thin films by close spaced sublimation technique

    OpenAIRE

    Wagner Anacleto Pinheiro; Vivienne Denise Falcão; Leila Rosa de Oliveira Cruz; Carlos Luiz Ferreira

    2006-01-01

    Unlike other thin film deposition techniques, close spaced sublimation (CSS) requires a short source-substrate distance. The kind of source used in this technique strongly affects the control of the deposition parameters, especially the deposition rate. When depositing CdTe thin films by CSS, the most common CdTe sources are: single-crystal or polycrystalline wafers, powders, pellets or pieces, a thick CdTe film deposited onto glass or molybdenum substrate (CdTe source-plate) and a sintered C...

  7. Comparative study of CdTe sources used for deposition of CdTe thin films by close spaced sublimation technique

    Directory of Open Access Journals (Sweden)

    Wagner Anacleto Pinheiro

    2006-03-01

    Full Text Available Unlike other thin film deposition techniques, close spaced sublimation (CSS requires a short source-substrate distance. The kind of source used in this technique strongly affects the control of the deposition parameters, especially the deposition rate. When depositing CdTe thin films by CSS, the most common CdTe sources are: single-crystal or polycrystalline wafers, powders, pellets or pieces, a thick CdTe film deposited onto glass or molybdenum substrate (CdTe source-plate and a sintered CdTe powder. In this work, CdTe thin films were deposited by CSS technique from different CdTe sources: particles, powder, compact powder, a paste made of CdTe and propylene glycol and source-plates (CdTe/Mo and CdTe/glass. The largest deposition rate was achieved when a paste made of CdTe and propylene glycol was used as the source. CdTe source-plates led to lower rates, probably due to the poor heat transmission, caused by the introduction of the plate substrate. The results also showed that compacting the powder the deposition rate increases due to the better thermal contact between powder particles.

  8. Physical vapor deposition of CdTe thin films at low temperature for solar cell applications

    International Nuclear Information System (INIS)

    Cadmium telluride is successfully utilized as an absorber material for thin film solar cells. Industrial production makes use of high substrate temperatures for the deposition of CdTe absorber layers. However, in order to exploit flexible substrates and to simplify the manufacturing process, lower deposition temperatures are beneficial. Based on the phase diagram of CdTe, predictions on the stoichiometry of CdTe thin films grown at low substrate temperatures are made in this work. These predictions were verified experimentally using additional sources of Cd and Te during the deposition of the CdTe thin films at different substrate temperatures. The deposited layers were analyzed with energy-dispersive X-ray spectroscopy. In case of CdTe layers which were deposited at substrate temperatures lower than 200 C without usage of additional sources we found a non-stoichiometric growth of the CdTe layers. The application of the additional sources leads to a stoichiometric growth for substrate temperatures down to 100 C which is a significant reduction of the substrate temperature during deposition.

  9. Deposition of Cl-doped CdTe polycrystalline films by close-spaced sublimation

    International Nuclear Information System (INIS)

    The effects of Cl-doping on the CdTe layers by the close-spaced sublimation (CSS) deposition were investigated. Cl-doped CdTe polycrystalline films were deposited on graphite substrates by CSS method using a mixture of CdTe and CdCl2 powder as a source. In X-ray diffraction (XRD) patterns of the obtained films with various deposition times, many diffraction peaks other than CdTe peaks were observed in the deposition times lower than 10 min. These diffraction peaks were probably due to the formation of chlorides of Cd, Te and C, such as CdCl2, TeCl4, Te3Cl2 and C10Cl8. X-ray fluorescence (XRF) and secondary ion mass spectrometry (SIMS) analyses revealed that a large amount of chlorine was contained in the films with the deposition times lower than 10 min, and that Cl concentration decreased with increasing the deposition time above 3 min. These results indicate that the films containing the chlorides of Cd, Te and C in addition to CdTe are formed in the initial stage of the CSS deposition using a mixture of CdTe and CdCl2 powder as a source. Cross-sectional images revealed that the grain size was decreased by the effect of Cl-doping. Furthermore, current-voltage (I -V) characteristics of the CdTe/graphite structures were measured, and it was found that the resistivity of the Cl-doped CdTe layer was much higher than that of the undoped CdTe layer. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  10. Spray Deposition of High Quality CuInSe2 and CdTe Films: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Curtis, C. J.; van Hest, M.; Miedaner, A.; Leisch, J.; Hersh, P.; Nekuda, J.; Ginley, D. S.

    2008-05-01

    A number of different ink and deposition approaches have been used for the deposition of CuInSe2 (CIS), Cu(In,Ga)Se2 (CIGS), and CdTe films. For CIS and CIGS, soluble precursors containing Cu, In, and Ga have been developed and used in two ways to produce CIS films. In the first, In-containing precursor films were sprayed on Mo-coated glass substrates and converted by rapid thermal processing (RTP) to In2Se3. Then a Cu-containing film was sprayed down on top of the In2Se3 and the stacked films were again thermally processed to give CIS. In the second approach, the Cu-, In-, and Ga-containing inks were combined in the proper ratio to produce a mixed Cu-In-Ga ink that was sprayed on substrates and thermally processed to give CIGS films directly. For CdTe deposition, ink consisting of CdTe nanoparticles dispersed in methanol was prepared and used to spray precursor films. Annealing these precursor films in the presence of CdCl2 produced large-grained CdTe films. The films were characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). Optimized spray and processing conditions are crucial to obtain dense, crystalline films.

  11. Electrochemical deposition and characterization of CdTe polycrystalline thin films

    Energy Technology Data Exchange (ETDEWEB)

    Bonilla, S.; Dalchiele, E.A. (Inst. de Fisica, Facultad de Ingenieria, Montevideo (Uruguay))

    1991-10-10

    CdTe thin films have been prepared by potentiostatic electrodeposition from acidic solutions containing CdSO{sub 4} and TeO{sub 2}, or CdCl{sub 2} and TeO{sub 2}. The films were characterized by X-ray diffraction and scanning electron microscopy. The influence of the deposition potential and bath temperature on the presence of tellurium and crystallite size was studied. The effect of annealing treatment on the increase in grain size of the electrochemically deposited CdTe films has been investigated. (orig.).

  12. Determination of dispersion parameters of thermally deposited CdTe thin film

    Science.gov (United States)

    Dhimmar, J. M.; Desai, H. N.; Modi, B. P.

    2016-05-01

    Cadmium Telluride (CdTe) thin film was deposited onto glass substrates under a vacuum of 5 × 10-6 torr by using thermal evaporation technique. The prepared film was characterized for dispersion analysis from reflectance spectra within the wavelength range of 300 nm - 1100 nm which was recorded by using UV-Visible spectrophotometer. The dispersion parameters (oscillator strength, oscillator wavelength, high frequency dielectric constant, long wavelength refractive index, lattice dielectric constant and plasma resonance frequency) of CdTe thin film were investigated using single sellimeir oscillator model.

  13. Orientational domains in metalorganic chemical vapor deposited CdTe(111) film on cube-textured Ni

    International Nuclear Information System (INIS)

    CdTe thin film was grown by metal organic chemical vapor deposition on cube-textured Ni substrate. The microstructures of the CdTe film and Ni substrate were studied using transmission electron microscopy (TEM) lattice imaging in cross sectional. The orientational relationships of multiple hetereoepitaxial domains in the CdTe film were examined by TEM diffraction. The observed epitaxy is [111]CdTe//[001]Ni. The adjacent domains in CdTe film have a 30° rotation with respect to each other as inferred by the observed different diffraction patterns obtained from different zone axes. The high resolution lattice imaging shows that lamellar twins dominate within each domain. Our results are compared with CdTe(111) film epitaxially grown on Si(001) substrate by molecular beam epitaxy reported in the literature. - Highlights: ► Epitaxial CdTe film grew on textured Ni at 350 °C despite of a large lattice mismatch. ► Epitaxial relationship is CdTe(111) parallel to Ni(001). ► 30° CdTe orientation domains inferred from transmission electron microscopy patterns ► Local inclined angle between CdTe and Ni at the interface is due to vertical mismatch. ► Single crystal-like epitaxial semiconductors can be grown on low cost metal sheet

  14. Preliminary study of CdTe and CdTe:Cu thin films nanostructures deposited by using DC magnetron sputtering

    International Nuclear Information System (INIS)

    Growth and properties of CdTe and CdTe:Cu thin films nanostrucures deposited by using dc magnetron sputtering are reported. Scanning electron microscope (SEM) was used to observe the surface morphologies of the thin films. At growth conditions of 250 °C and 14 W, CdTe films did not yet evenly deposited. However, at growth temperature and plasma power of 325 °C and 43 W, both CdTe and CdTe:Cu(2%) have deposited on the substrates. In this condition, the morphology of the films indicate that the films have a grain-like nanostructures. Grain size diameter of about 200 nm begin to appear on top of the films. Energy Dispersive X-rays spectroscopy (EDX) was used to investigate chemical elements of the Cu doped CdTe film deposited. It was found that the film deposited consist of Cd, Te and Cu elements. XRD was used to investigate the full width at half maximum (FWHM) values of the thin films deposited. The results show that CdTe:Cu(2%) thin film has better crystallographic properties than CdTe thin film. The UV-Vis spectrometer was used to investigate the optical properties of thin films deposited. The transmittance spectra showed that transmittance of CdTe:Cu(2%) film is lower than CdTe film. It was found that the bandgap energy of CdTe and CdTe:Cu(2%) thin films of about 1.48 eV

  15. Effects of various deposition times and RF powers on CdTe thin film growth using magnetron sputtering

    Science.gov (United States)

    Ghorannevis, Z.; Akbarnejad, E.; Ghoranneviss, M.

    2016-04-01

    Cadmium telluride (CdTe) is a p-type II-VI compound semiconductor, which is an active component for producing photovoltaic solar cells in the form of thin films, due to its desirable physical properties. In this study, CdTe film was deposited using the radio frequency (RF) magnetron sputtering system onto a glass substrate. To improve the properties of the CdTe film, effects of two experimental parameters of deposition time and RF power were investigated on the physical properties of the CdTe films. X-ray Diffraction (XRD), atomic force microscopy (AFM) and spectrophotometer were used to study the structural, morphological and optical properties of the CdTe samples grown at different experimental conditions, respectively. Our results suggest that film properties strongly depend on the experimental parameters and by optimizing these parameters, it is possible to tune the desired structural, morphological and optical properties. From XRD data, it is found that increasing the deposition time and RF power leads to increasing the crystallinity as well as the crystal sizes of the grown film, and all the films represent zinc blende cubic structure. Roughness values given from AFM images suggest increasing the roughness of the CdTe films by increasing the RF power and deposition times. Finally, optical investigations reveal increasing the film band gaps by increasing the RF power and the deposition time.

  16. Effects of various deposition times and RF powers on CdTe thin film growth using magnetron sputtering

    Science.gov (United States)

    Ghorannevis, Z.; Akbarnejad, E.; Ghoranneviss, M.

    2016-09-01

    Cadmium telluride (CdTe) is a p-type II-VI compound semiconductor, which is an active component for producing photovoltaic solar cells in the form of thin films, due to its desirable physical properties. In this study, CdTe film was deposited using the radio frequency (RF) magnetron sputtering system onto a glass substrate. To improve the properties of the CdTe film, effects of two experimental parameters of deposition time and RF power were investigated on the physical properties of the CdTe films. X-ray Diffraction (XRD), atomic force microscopy (AFM) and spectrophotometer were used to study the structural, morphological and optical properties of the CdTe samples grown at different experimental conditions, respectively. Our results suggest that film properties strongly depend on the experimental parameters and by optimizing these parameters, it is possible to tune the desired structural, morphological and optical properties. From XRD data, it is found that increasing the deposition time and RF power leads to increasing the crystallinity as well as the crystal sizes of the grown film, and all the films represent zinc blende cubic structure. Roughness values given from AFM images suggest increasing the roughness of the CdTe films by increasing the RF power and deposition times. Finally, optical investigations reveal increasing the film band gaps by increasing the RF power and the deposition time.

  17. Radiative recombination mechanisms in CdTe thin films deposited by elemental vapor transport

    Energy Technology Data Exchange (ETDEWEB)

    Collins, Shamara [Department of Electrical Engineering, University of South Florida, 4202 East Fowler Ave, Tampa, FL 33620 (United States); Vatavu, Sergiu, E-mail: svatavu@usm.md [Department of Electrical Engineering, University of South Florida, 4202 East Fowler Ave, Tampa, FL 33620 (United States); Faculty of Physics and Engineering, Moldova State University, 60 A. Mateevici str., Chisinau, MD-2009, Republic of Moldova (Moldova, Republic of); Evani, Vamsi; Khan, Md; Bakhshi, Sara; Palekis, Vasilios [Department of Electrical Engineering, University of South Florida, 4202 East Fowler Ave, Tampa, FL 33620 (United States); Rotaru, Corneliu [Faculty of Physics and Engineering, Moldova State University, 60 A. Mateevici str., Chisinau, MD-2009, Republic of Moldova (Moldova, Republic of); Ferekides, Chris [Department of Electrical Engineering, University of South Florida, 4202 East Fowler Ave, Tampa, FL 33620 (United States)

    2015-05-01

    A photoluminesence (PL) study of the radiative recombination mechanisms for CdTe films deposited under different Cd and Te overpressure by elemental vapor transport is presented. The experiment and analysis have been carried out in the temperature range of 12-130 K. The intensity of the PL laser excitation beam was varied by two orders of magnitude. It has been established that the bands in the 1.47-1.50 eV are determined by transitions involving shallow D and A states and the 1.36x-1.37x eV band is due to band to level transitions. Deep transitions at 1.042 eV and 1.129 eV are due to radiative transitions to levels determined by CdTe native defects. - Highlights: • Photoluminescense (PL) of CdTe thin films is present in the 0.8-1.6 eV spectral region. • High intensity excitonic peaks are among the main radiative paths. • Radiative transitions at 1.36x eV are assisted by dislocations caused levels. • Extremal Cd/Te overpressure ratios enhance PL for 1.497 eV, 1.486 eV, 1.474 eV bands. • PL intensity reaches its max value for the 0.45 and 1.25 Cd/Te overpressure ratios.

  18. Deposition of CdTe films under microgravity: Foton M3 mission

    Energy Technology Data Exchange (ETDEWEB)

    Benz, K.W.; Croell, A. [Freiburger Materialforschungszentrum FMF, Albert-Ludwigs-Universitaet Freiburg (Germany); Zappettini, A.; Calestani, D. [CNR Parma, Instituto Materiali Speciali per Elettronica e Magnetismo IMEM, Fontani Parma (Italy); Dieguez, E. [Universidad Autonoma de Madrid (Spain). Departamento de Fisica de Materiales; Carotenuto, L.; Bassano, E. [Telespazio Napoli, Via Gianturco 31, 80146 Napoli (Italy); Fiederle, M.

    2009-10-15

    Experiments of deposition of CdTe films have been carried out under microgravity in the Russian Foton M3 mission. The influence of gravity has been studied with these experiments and compared to the results of simulations. The measured deposition rate could be confirmed by the theoretical results for lower temperatures. For higher temperatures the measured thickness of the deposited films was larger compared to the theoretical data. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  19. Structural and optical properties of Cu-doped CdTe films with hexagonal phase grown by pulsed laser deposition

    OpenAIRE

    F. de Moure-Flores; J. G. Quiñones-Galván; A. Guillén-Cervantes; Santoyo-Salazar, J.; A. Hernández-Hernández; Olvera, M. de la L.; M. Zapata-Torres; Meléndez-Lira, M.

    2012-01-01

    Cu-doped CdTe thin films were prepared by pulsed laser deposition on Corning glass substrates using powders as target. Films were deposited at substrate temperatures ranging from 100 to 300 °C. The X-ray diffraction shows that both the Cu-doping and the increase in the substrate temperature promote the presence of the hexagonal CdTe phase. For a substrate temperature of 300 °C a CdTe:Cu film with hexagonal phase was obtained. Raman and EDS analysis indicate that the films grew with an excess ...

  20. Thin-film CdTe photovoltaic cells by laser deposition and rf sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.; Bohn, R.G.; Bhat, A.; Tabory, C.; Shao, M.; Li, Y.; Savage, M.E.; Tsien, L. (Department of Physics and Astronomy, The University of Toledo, Toledo, Ohio 43606 (United States))

    1992-12-01

    Laser-driven physical vapor deposition (LDPVD) and radio-frequency (rf) sputtering have been used to fabricate thin-film solar cells on SnO[sub 2]-coated glass substrates. The laser-ablation process readily permits the use of several target materials in the same vacuum chamber and complete solar cell structures have been fabricated on SnO[sub 2]-coated glass using LDPVD for the CdS, CdTe, and CdCl[sub 2]. To date the best devices ([similar to]9% AM1.5) have been obtained after a post-deposition anneal at 400 [degree]C. In addition, cells have been fabricated with the combination of LDPVD CdS, rf-sputtered CdTe, and LDPVD CdCl[sub 2]. The performance of these cells indicates considerable promise for the potential of rf sputtering for CdTe photovoltaic devices. The physical mechanisms of LDPVD have been studied by transient optical spectroscopy on the laser ablation plume. These measurements have shown that, e.g., Cd is predominantly in the neutral atomic state in the plume but with a large fraction which is highly excited internally ([ge]6 eV) and that the typical neutral Cd translational kinetic energies perpendicular to the target are 20 eV and greater. Quality of as-grown and annealed films has been analyzed by optical absorption. Raman scattering, photoluminescence, electrical conductivity, Hall effect, x-ray diffraction, and SEM/EDS.

  1. Physical properties of spray deposited CdTe thin films: PEC performance

    Institute of Scientific and Technical Information of China (English)

    V. M. Nikale; S. S. Shinde; C. H. Bhosale; K.Y. Rajpure

    2011-01-01

    p-CdTe thin films were prepared by spray pyrolysis under different ambient conditions and characterized using photoelectrochemical (PEC),X-ray diffraction (XRD),scanning electron microscopy,energy-dispersive analysis by X-ray (EDAX),and optical transmission studies.The different preparative parameters viz solution pH,solution quantity,substrate temperature and solution concentration have been optimized by the PEC technique in order to get good-quality photosensitive material.XRD analysis shows the polycrystalline nature of the film,having cubic structure with strong (111) orientation.Micrographs reveal that grains are uniformly distributed over the surface of the substrate indicating the well-defined growth ofpolycrystalline CdTe thin film.The EDAX study for the sample deposited at optimized preparative parameters shows the nearly stoichiometric Cd:Te ratio.Optical absorption shows the presence of direct transition with band gap energy of 1.5 eV.Deposited films exhibit the highest photocurrent of 2.3 mA,a photovoltage of 462 mV,a 0.48 fill factor and 3.4% efficiency for the optimized preparative parameters.

  2. Inline atmospheric pressure metal-organic chemical vapour deposition for thin film CdTe solar cells

    International Nuclear Information System (INIS)

    A detailed study has been undertaken to assess the deposition of CdTe for thin film devices via an inline atmospheric pressure metal-organic chemical vapour deposition (AP-MOCVD) reactor. The precursors for CdTe synthesis were released from a showerhead assembly normal to a transparent conductive oxide (TCO)/glass substrate, previously coated with a CdZnS window layer using a conventional batch AP-MOCVD reactor with horizontal flow delivery. Under a simulated illumination with air mass coefficient 1.5 (AM1.5), the initial best cell conversion efficiency (11.2%) for such hybrid cells was comparable to a reference device efficiency (∼ 13%), grown entirely in the AP-MOCVD batch reactor. The performance and structure of the hybrid and conventional devices are compared for spectral response, CdTe grain morphology and crystal structure. These preliminary results reported on the transfer from a batch to an inline AP-MOCVD reactor which holds a good potential for the large-scale production of thin film photovoltaics devices and related materials. - Highlights: • Inline metal-organic chemical vapour deposition (MOCVD) used to grow CdTe films • Desired dopant profiles in CdTe:As achieved with inline MOCVD reactor • Initial conversion efficiency of 11.2% was comparable to batch devices (∼ 13%). • Inline MOCVD holds a good potential for large-scale thin film photovoltaics production

  3. Atmospheric pressure chemical vapor deposition of CdTe for high efficiency thin film PV devices: Annual subcontract report, 26 January 1999--25 January 2000

    Energy Technology Data Exchange (ETDEWEB)

    Meyers, P. V.; Kee, R.; Wolden, C.; Kestner, J.; Raja, L.; Kaydanov, V.; Ohno, T.; Collins, R.; Fahrenbruch, A.

    2000-05-30

    ITN's three year project Atmospheric Pressure Chemical Vapor Deposition (APCVD) of CdTe for High Efficiency Thin Film PV Devices has the overall objectives of improving thin film CdTe PV manufacturing technology and increasing CdTe PV device power conversion efficiency. CdTe deposition by APCVD employs the same reaction chemistry as has been used to deposit 16% efficient CdTe PV films, i.e., close spaced sublimation, but employs forced convection rather than diffusion as a mechanism of mass transport. Tasks of the APCVD program center on demonstration of APCVD of CdTe films, discovery of fundamental mass transport parameters, application of established engineering principles to the deposition of CdTe films, and verification of reactor design principles which could be used to design high throughput, high yield manufacturing equipment. Additional tasks relate to improved device measurement and characterization procedures that can lead to a more fundamental understanding of CdTe PV device operation and ultimately to higher device conversion efficiency and greater stability. Under the APCVD program, device analysis goes beyond conventional one-dimensional device characterization and analysis toward two dimension measurements and modeling. Accomplishments of the second year of the APCVD subcontract include: deposition of the first APCVD CdTe; identification of deficiencies in the first generation APCVD reactor; design, fabrication and testing of a ``simplified'' APCVD reactor; deposition of the first dense, adherent APCVD CdTe films; fabrication of the first APCVD CdTe PV device; modeling effects of CdSTe and SnOx layers; and electrical modeling of grain boundaries.

  4. Investigation of deposition parameters for the non-aqueous electroplating of CdTe films and application in electrochemical photovoltaic cells

    Energy Technology Data Exchange (ETDEWEB)

    Gore, R.B.; Pandey, R.K.; Kulkarni, S.K.

    1989-03-01

    The cathodic deposition characteristics of Cd/sup 2+/ and Te/sup 4+/ in a non-aqueous electroplating bath have been studied. The deposition parameters have been optimised to yield uniform and well adhering films of CdTe in a non-aqueous medium. The influence of the potentiostatic and galvanostatic deposition conditions on the stoichiometry, structure and photoanodic behaviour of the CdTe films are also discussed.

  5. Effect of Substrate Temperature on Structural and Optical Properties of Nanocrystalline CdTe Thin Films Deposited by Electron Beam Evaporation

    Directory of Open Access Journals (Sweden)

    M. Rigana Begam

    2013-07-01

    Full Text Available Nanocrystalline Cadmium Telluride (CdTe thin films were deposited onto glass substrates using electron beam evaporation technique. The effect of substrate temperature on the structural, morphological and optical properties of CdTe thin films has been investigated. All the CdTe films exhibited zinc blende structure with (111 preferential orientation. The crystallite size of the films increased from 35 nm to 116 nm with the increase of substrate temperature and the band gap of the films decreased from 2.87 eV to 2.05 eV with the increase of the crystallite size.

  6. X-ray, electron microscopy and photovoltaic studies on CdTe thin films deposited normally at different substrate temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Saha, S.; Pal, U.; Samantaray, B.K.; Chaudhuri, A.K. (Indian Inst. of Tech., Kharagpur (IN). Dept. of Physics and Meteorology); Banerjee, H.D. (Indian Inst. of Tech., Kharagpur (India). Materials Science Centre)

    1990-12-01

    X-ray diffraction, transmission electron microscopy and electron diffraction studies were conducted on CdTe thin films deposited on glass substrates kept at different substrate temperatures. Variation of the different structural parameters, such as lattice constant, crystallite size, r.m.s. strain, dislocation density and stacking fault probability with substrate temperature, was investigated in the temperature range 300 to 498 K. An increase in the lattice constant and crystallite size values and a decrease in the other parameters with increase in temperature of the substrate was observed. A photovoltage was observed for CdTe film deposited normally on glass substrates kept at higher substrate temperatures. The development of photovoltage in the film is explained in the light of the formation of crystallites of variable structure. (author).

  7. Atmospheric Pressure Chemical Vapor Deposition of CdTe for High-Efficiency Thin-Film PV Devices; Annual Report, 26 January 1998-25 January 1999

    International Nuclear Information System (INIS)

    ITN's 3-year project, titled ''Atmospheric Pressure Chemical Vapor Deposition (APCVD) of CdTe for High-Efficiency Thin-Film Photovoltaic (PV) Devices,'' has the overall objectives of improving thin-film CdTe PV manufacturing technology and increasing CdTe PV device power conversion efficiency. CdTe deposition by APCVD employs the same reaction chemistry as has been used to deposit 16%-efficient CdTe PV films, i.e., close-spaced sublimation, but employs forced convection rather than diffusion as a mechanism of mass transport. Tasks of the APCVD program center on demonstrating APCVD of CdTe films, discovering fundamental mass-transport parameters, applying established engineering principles to the deposition of CdTe films, and verifying reactor design principles that could be used to design high-throughput, high-yield manufacturing equipment. Additional tasks relate to improved device measurement and characterization procedures that can lead to a more fundamental understanding of CdTe PV device operation, and ultimately, to higher device conversion efficiency and greater stability. Specifically, under the APCVD program, device analysis goes beyond conventional one-dimensional device characterization and analysis toward two-dimension measurements and modeling. Accomplishments of the first year of the APCVD subcontract include: selection of the Stagnant Flow Reactor design concept for the APCVD reactor, development of a detailed reactor design, performance of detailed numerical calculations simulating reactor performance, fabrication and installation of an APCVD reactor, performance of dry runs to verify reactor performance, performance of one-dimensional modeling of CdTe PV device performance, and development of a detailed plan for quantification of grain-boundary effects in polycrystalline CdTe devices

  8. CdTe thin film solar cells produced using a chamberless inline process via metalorganic chemical vapour deposition

    International Nuclear Information System (INIS)

    Cd1−xZnxS and CdTe:As thin films were deposited using a recently developed chamberless inline process via metalorganic chemical vapour deposition (MOCVD) at atmospheric pressure and assessed for fabrication of CdTe photovoltaic (PV) solar cells. Initially, CdS and Cd1−xZnxS coatings were applied onto 15 × 15 cm2 float glass substrates, characterised for their optical properties, and then used as the window layer in CdTe solar cells which were completed in a conventional MOCVD (batch) reactor. Such devices provided best conversion efficiency of 13.6% for Cd0.36Zn0.64S and 10% for CdS which compare favourably to the existing baseline MOCVD (batch reactor) devices. Next, sequential deposition of Cd0.36Zn0.64S and CdTe:As films was realised by the chamberless inline process. The chemical composition of a 1 μm CdTe:As/150 nm Cd0.36Zn0.64S bi-layer was observed via secondary ions mass spectroscopy, which showed that the key elements are uniformly distributed and the As doping level is suitable for CdTe device applications. CdTe solar cells formed using this structure provided a best efficiency of 11.8% which is promising for a reduced absorber thickness of 1.25 μm. The chamberless inline process is non-vacuum, flexible to implement and inherits from the legacy of MOCVD towards doping/alloying and low temperature operation. Thus, MOCVD enabled by the chamberless inline process is shown to be an attractive route for thin film PV applications. - Highlights: • CdS, CdZnS and CdTe thin films grown by a chamberless inline process • The inline films assessed for fabricating CdTe solar cells • 13.6% conversion efficiency obtained for CdZnS/CdTe cells

  9. The large-area CdTe thin film for CdS/CdTe solar cell prepared by physical vapor deposition in medium pressure

    Science.gov (United States)

    Luo, Run; Liu, Bo; Yang, Xiaoyan; Bao, Zheng; Li, Bing; Zhang, Jingquan; Li, Wei; Wu, Lili; Feng, Lianghuan

    2016-01-01

    The Cadmium telluride (CdTe) thin film has been prepared by physical vapor deposition (PVD), the Ar + O2 pressure is about 0.9 kPa. This method is a newer technique to deposit CdTe thin film in large area, and the size of the film is 30 × 40 cm2. This method is much different from the close-spaced sublimation (CSS), as the relevance between the source temperature and the substrate temperature is weak, and the gas phase of CdTe is transferred to the substrate by Ar + O2 flow. Through this method, the compact and uniform CdTe film (30 × 40 cm2) has been achieved, and the performances of the CdTe thin film have been determined by transmission spectrum, SEM and XRD. The film is observed to be compact with a good crystallinity, the CdTe is polycrystalline with a cubic structure and a strongly preferred (1 1 1) orientation. Using the CdTe thin film (3 × 5 cm2) which is taken from the deposited large-area film, the 14.6% efficiency CdS/CdTe thin film solar cell has been prepared successfully. The structure of the cell is glass/FTO/CdS/CdTe/graphite slurry/Au, short circuit current density (Jsc) of the cell is 26.9 mA/cm2, open circuit voltage (Voc) is 823 mV, and filling factor (FF) is 66.05%. This technique can be a quite promising method to apply in the industrial production, as it has great prospects in the fabricating of large-area CdTe film.

  10. Influence of post-deposition heat treatment on optical properties derived from UV–vis of cadmium telluride (CdTe) thin films deposited on amorphous substrate

    International Nuclear Information System (INIS)

    Graphical abstract: - Highlights: • Annealing-induced change in optical parameters of CdTe film was derived from UV–vis study. • Optical constants of the films were evaluated using Swanepoel method. • Dispersion energy data obeyed the single oscillator of the Wemple−Didomenico model. • Cd deficiency of the film confirmed the p-type conductive nature. - Abstract: In this work, we report on post-deposition heat treatment (annealing)-induced change in optical properties derived from UV–vis study of CdTe thin films prepared on amorphous glass substrate by electron beam evaporation technique. Annealing effect gives rise to the enhancement in crystalline nature (zinc blende structure) of CdTe films with (1 1 1) preferred orientation. The average transmittance was increased with the annealing temperature and the slight shift in transmission threshold towards higher wavelength region revealed the systematic reduction in optical energy band gap. The existence of shallow level just below the conduction band, within the band gap was identified in the range of 0.23 and 0.14 eV for the films annealed at 200 and 450 °C, respectively. The optical quality of deposited films was confirmed by the photoluminescence study. In addition, the scanning electron microscopic measurement supports the result of X-ray diffraction study. The Swanepoel, Hervé-Vandamme, and Wemple−DiDomenico models have been employed to evaluate the various optical parameters of CdTe films. These results are correlated well with other physical properties and discussed with the possible concepts underlying the phenomena

  11. Characterization of CdTe films with in situ CdCl{sub 2} treatment grown by a simple vapor phase deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Rios Flores, Araceli, E-mail: arios@mda.cinvestav.mx [Applied Physics Department, CINVESTAV-IPN Merida, C.P. 97310 Merida, Yucatan (Mexico); Castro-Rodriguez, R.; Pena, J.L. [Applied Physics Department, CINVESTAV-IPN Merida, C.P. 97310 Merida, Yucatan (Mexico); Romeo, N.; Bosio, A. [Dipartimento di fisica, Universita di Parma, Campus Universitario, Parco Area delle Scienza, 43100 Parma (Italy)

    2009-05-15

    A unique vapor phase deposition (VPD) technique was designed and built to achieve in situ CdCl{sub 2} treatment of CdTe film. The substrate temperature was 400 deg. C, and the temperature of CdTe mixture with CdCl{sub 2} source was 500 deg. C. The structural and morphological properties of CdTe have been studied as a function of wt.% CdCl{sub 2} concentration by using X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), scanning electron microscopy (SEM) and atomic force microscopy (AFM). XRD measurements show that the presence of CdCl{sub 2} vapor induces (1 1 1)-oriented growth in the CdTe film. SEM measurements have shown enhance growth of grains, in the presence of CdCl{sub 2}. From AFM the roughness of the films showed a heavy dependence on CdCl{sub 2} concentration. In the presence of 4% CdCl{sub 2} concentration, the CdTe films roughness has a root mean square (rms) value of about 275 A. This value is about 831 A for the non-treated CdTe films.

  12. A photoluminescence comparison of CdTe thin films grown by molecular-beam epitaxy, metalorganic chemical vapor deposition, and sputtering in ultrahigh vacuum

    Science.gov (United States)

    Feng, Z. C.; Bevan, M. J.; Krishnaswamy, S. V.; Choyke, W. J.

    1988-09-01

    High perfection CdTe thin films have been grown on (001) InSb and CdTe substrates by molecular-beam epitaxy, metalorganic chemical vapor deposition (MOCVD), and sputtering in ultrahigh vacuum techniques. The quality of the as-grown CdTe films are characterized by 2-K photoluminescence. The spectra show strong and sharp exciton transitions and weak 1.40-1.50-eV defect-related bands. Radiative defect densities of lower than 0.002 are realized. High-resolution spectroscopy shows that the full width at half maximum of the principal bound exciton lines is about 0.1 meV. Such small ρ values and narrow photoluminescence lines have not been previously reported. The largest luminescence efficiency is observed for MOCVD-CdTe films grown on CdTe substrates. A variety of impurities appear to be responsible for the observed radiative transitions in these three kinds of CdTe films. We attempt to assign the observed impurity related lines by a comparison with ``known'' impurities in bulk CdTe spectra given in the literature.

  13. Monte Carlo computer simulation of the deposition of CdTe thin films by close-spaced sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Romeo, N.; Tedeschi, R.; Ferrari, L.; Pasquali, S.; Bosio, A.; Canevari, V. [Parma Univ. (Italy). Dipartimento di Fisica

    2000-10-16

    Thin film solar cells based on the CdS/CdTe heterojunction, where the CdTe polycrystalline layer is deposited making use of the close-spaced sublimation (CSS) technique have attained a very good level of conversion efficiency in recent times. Despite this apparently consolidated situation the debate on the formation of the CdS/CdTe heterojunction is still open indicating that a certain margin of improvement is still possible. In particular, the conclusion that a CdS{sub x}Te{sub 1-x} alloy is formed at the CdS/CdTe interface due to interdiffusion that takes place during fabrication. The extent of the interdiffusion and the value of x depend on many factors such as deposition temperature, gas pressure and geometrical parameters. The situation is even more complicated because while the deposition is in progress, the ratio between the number of Te and the Cd atoms which are reaching the target is invariably greater than one. To shed some light on these issues it is mandatory to know at least the exact Te/Cd ratio as a function of the deposition parameters. To this end we carried out a Monte Carlo computer simulation of the CdTe deposition in our CSS equipment. The computer code was implemented starting from very simple hypotheses simulating the deposition in perfect gas at constant temperature. Subsequently, we added more physical reality including temperature gradient between source and target. The code was then finally optimized introducing the usual null-event method which confirmed the consistency of our results. (orig.)

  14. Eects of Post Deposition Treatments on Vacuum Evaporated CdTe Thin Films and CdS=CdTe Heterojunction Devices

    Science.gov (United States)

    Bayhan, Habibe; Erçelebý, Çiðdem

    1998-05-01

    CdTe, CdS thin films and n-CdS/p-CdTe heterostructures have been prepared by conventional vacuum evaporation technique. Some post deposition treatments to optimize the device efficiency have been analyzed and the effects of the individual process steps on the material and device properties were investigated. Annealing in air with and without CdCl2-treatment decreased the CdTe resistivity. The CdCl2-dip followed by annealing in air at 300°C for 5 min improved the grain size and polycrystalline nature of CdTe thin films. Solar efficiency improvements were achieved when heterojunctions were prepared on successively treated (i.e. etched, air annealed, CdCl2-processed) CdTe surfaces. Etching of the CdTe surface with potassium dichromate solution prior to metal contact deposition lead to the formation of low-resistance Au contacts and increase in open circuit voltage and fill factor values.

  15. Eects of Post Deposition Treatments on Vacuum Evaporated CdTe Thin Films and CdS=CdTe Heterojunction Devices

    OpenAIRE

    BAYHAN, Habibe; ERÇELEBİ, Çiğdem

    1998-01-01

    CdTe, CdS thin films and n-CdS/p-CdTe heterostructures have been prepared by conventional vacuum evaporation technique. Some post deposition treatments to optimize the device efficiency have been analyzed and the effects of the individual process steps on the material and device properties were investigated. Annealing in air with and without CdCl2-treatment decreased the CdTe resistivity. The CdCl2-dip followed by annealing in air at 300\\circC for 5 min improved the grain size and polycrystal...

  16. Growth of CdTe: Al films

    International Nuclear Information System (INIS)

    CdTe: AI films were grown by the close space vapor transport technique combined with free evaporation (CSVT-FE). The Aluminum (Al) evaporation was made by two kinds of sources: one made of graphite and the other of tantalum. The films were deposited on glass substrates. The Al source temperature was varied maintaining the CdTe source temperature fixed as well as the substrate temperature. The films were characterized by x-ray energy dispersive analysis (EDAX), x-ray diffraction and optical transmission. The results showed for the films grown with the graphite source for Al evaporation, the Al did not incorporate in the CdTe matrix, at least to the level of EDAX sensitivity; they maintained the same crystal structure and band gap. For the samples grown with the tantalum source, we were able to incorporate the Al. The x-ray diffraction patterns show that the films have a crystal structure that depends on Al concentration. They were cubic up to 2.16 at. % Al concentration; for 19.65 at. % we found a mixed phase; for Al concentration higher than 21 at. % the films were amorphous. For samples with cubic structure it was found that the lattice parameter decreases and the band gap increases with Al concentration. (Author)

  17. Influence of plasma parameters and substrate temperature on the structural and optical properties of CdTe thin films deposited on glass by laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Quiñones-Galván, J. G.; Santana-Aranda, M. A.; Pérez-Centeno, A. [Departamento de Física, Centro Universitario de Ciencias Exactas e Ingenierías, Universidad de Guadalajara, Boulevard Marcelino García Barragán 1421, Guadalajara, Jalisco C.P. 44430 (Mexico); Camps, Enrique [Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado Postal 18-1027, D.F., C.P. 11801 (Mexico); Campos-González, E.; Guillén-Cervantes, A.; Santoyo-Salazar, J.; Zelaya-Angel, O. [Departamento de Física, CINVESTAV-IPN, Apartado Postal 14-740, D. F. C.P. 07360 (Mexico); Hernández-Hernández, A. [Escuela Superior de Apan, Universidad Autónoma del Estado de Hidalgo, Calle Ejido de Chimalpa Tlalayote s/n Colonia Chimalpa, Apan Hidalgo (Mexico); Moure-Flores, F. de [Facultad de Química, Materiales, Universidad Autónoma de Querétaro, Querétaro C.P. 76010 (Mexico)

    2015-09-28

    In the pulsed laser deposition of thin films, plasma parameters such as energy and density of ions play an important role in the properties of materials. In the present work, cadmium telluride thin films were obtained by laser ablation of a stoichiometric CdTe target in vacuum, using two different values for: substrate temperature (RT and 200 °C) and plasma energy (120 and 200 eV). Structural characterization revealed that the crystalline phase can be changed by controlling both plasma energy and substrate temperature; which affects the corresponding band gap energy. All the thin films showed smooth surfaces and a Te rich composition.

  18. High-efficiency CdTe thin-film solar cells using metalorganic chemical vapor deposition techniques

    Science.gov (United States)

    Nouhi, A.; Stirn, R. J.; Meyers, P. V.; Liu, C. H.

    1989-06-01

    Energy conversion efficiency of metalorganic chemical vapor deposited CdTe as an intrinsic active layer in n-i-p solar cell structures is reported. Small-area devices with efficiencies over 9 percent have been demonstrated. I-V characteristics, photospectral response, and the results of Auger profiling of structural composition for typical devices will be presented. Also presented are preliminary results on similar photovoltaic devices having Cd(0.85)Mn(0.15)Te in place of CdTe as an i layer.

  19. High-efficiency CdTe thin-film solar cells using metalorganic chemical vapor deposition techniques

    Energy Technology Data Exchange (ETDEWEB)

    Nouhi, A.; Stirn, R.J.; Meyers, P.V.; Liu, C.H.

    1989-05-01

    Energy conversion efficiency of metalorganic chemical vapor deposited CdTe as an intrinsic active layer in n-i-p solar cell structures is reported. Small-area devices with efficiencies over 9% have been demonstrated. I--V characteristics, photospectral response, and the results of Auger profiling of structural composition for typical devices will be presented. Also presented are preliminary results on similar photovoltaic devices having Cd/sub 0.85/Mn/sub 0.15/Te in place of CdTe as an i layer.

  20. High-efficiency CdTe thin-film solar cells using metalorganic chemical vapor deposition techniques

    Science.gov (United States)

    Nouhi, A.; Stirn, R. J.; Meyers, P. V.; Liu, C. H.

    1989-01-01

    Energy conversion efficiency of metalorganic chemical vapor deposited CdTe as an intrinsic active layer in n-i-p solar cell structures is reported. Small-area devices with efficiencies over 9 percent have been demonstrated. I-V characteristics, photospectral response, and the results of Auger profiling of structural composition for typical devices will be presented. Also presented are preliminary results on similar photovoltaic devices having Cd(0.85)Mn(0.15)Te in place of CdTe as an i layer.

  1. Electrochemical Deposition of CdTe Semiconductor Thin Films for Solar Cell Application Using Two-Electrode and Three-Electrode Configurations: A Comparative Study

    Directory of Open Access Journals (Sweden)

    O. K. Echendu

    2016-01-01

    Full Text Available Thin films of CdTe semiconductor were electrochemically deposited using two-electrode and three-electrode configurations in potentiostatic mode for comparison. Cadmium sulphate and tellurium dioxide were used as cadmium and tellurium sources, respectively. The layers obtained using both configurations exhibit similar structural, optical, and electrical properties with no specific dependence on any particular electrode configuration used. These results indicate that electrochemical deposition (electrodeposition of CdTe and semiconductors in general can equally be carried out using two-electrode system as well as the conventional three-electrode system without compromising the essential qualities of the materials produced. The results also highlight the advantages of the two-electrode configuration in process simplification, cost reduction, and removal of a possible impurity source in the growth system, especially as the reference electrode ages.

  2. High-quality CdTe films from nanoparticle precursors

    Energy Technology Data Exchange (ETDEWEB)

    Schulz, D.L.; Pehnt, M.; Urgiles, E. [National Renewable Energy Lab., Golden, CO (United States)] [and others

    1996-05-01

    In this paper the authors demonstrate that nanoparticulate precursors coupled with spray deposition offers an attractive route into electronic materials with improved smoothness, density, and lower processing temperatures. Employing a metathesis approach, cadmium iodide was reacted with sodium telluride in methanol solvent, resulting in the formation of soluble NaI and insoluble CdTe nanoparticles. After appropriate chemical workup, methanol-capped CdTe colloids were isolated. CdTe thin film formation was achieved by spray depositing the nanoparticle colloids (25-75 {Angstrom} diameter) onto substrates at elevated temperatures (T = 280-440{degrees}C) with no further thermal treatment. These films were characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Cubic CdTe phase formation was observed by XRD, with a contaminant oxide phase also detected. XPS analysis showed that CdTe films produced by this one-step method contained no Na or C and substantial O. AFM gave CdTe grain sizes of {approx}0.1-0.3 {mu}m for film sprayed at 400{degrees}C. A layer-by-layer film growth mechanism proposed for the one-step spray deposition of nanoparticle precursors will be discussed.

  3. Properties of CdTe films deposited by electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Murali, K.R.; Radhakrishna, I.; Nagaraja Rao, K.; Venkatesan, V.K. (Central Electrotechnical Research Inst., Karaikudi (India))

    1990-04-01

    Cadmium telluride thin films were prepared by electron beam evaporation on glass substrates kept at different temperatures in the range 30-300degC. The films were characterized by X-ray diffraction, scanning electron microscopy and optical absorption measurements. The conductivity of the films was measured in the temperature range 100-300 K. While the low temperature data (100-200 K) could be explained by the variable range hopping process, the high temperature data (200-300 K) could be explained on the basis of Seto's model for thermionic emission of the carriers over the grain boundaries. Transmission spectra have indicated a direct and gap around 1.55 eV. (orig.).

  4. Growth of CdTe films on GaAs by ionized cluster beam epitaxy

    Science.gov (United States)

    Tang, H. P.; Feng, J. Y.; Fan, Y. D.; Li, H. D.

    1991-06-01

    Stoichiometric epitaxial films of CdTe were grown on (100)GaAs substrates by ionized cluster beam (ICB) epitaxy. Streaky RHEED patterns indicated good crystallinity and surface flatness of the epitaxial CdTe films. CdTe(100) orientation was obtained when the substrate preheating temperature was 480°C, while CdTe growth inboth (100) and (111) orientations occured when the substrate preheating temperature was above 550°C. The characteristics of the ICB growth process were investigated and the cluster-involving growth behavior has been evidenced. When sufficient clusters were generated in the deposition beam under adequate source vapor pressures, the crystalline quality of the resulting CdTe epilayers improved significantly with the increase of kinetic energy of the CdTe clusters. The best CdTe epilayer obtained exhibited a CdTe(400) double crystal rocking curve (DCRC) having a FWHM of 630 arc sec.

  5. Growth of CdTe films on GaAs by ionized cluster beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Tang, H.P.; Feng, J.Y.; Fan, Y.D.; Li, H.D. (Dept. of Materials Science and Engineering, Tsinghua Univ., Beijing (China))

    1991-06-01

    Stoichiometric epitaxial films of CdTe were grown on (100)GaAs substrates by ionized cluster beam (ICB) epitaxy. Streaky RHEED patterns indicated good crystallinity and surface flatness of the epitaxial CdTe films. CdTe(100) orientation was obtained when the substrate preheating temperature was 480degC, while CdTe growth in both (100) and (111) orientations occurred when the substrate preheating temperature was above 550degC. The characteristics of the ICB growth process were investigated and the cluster-involving growth behavior has been evidenced. When sufficient clusters were generated in the deposition beam under adequate source vapor pressures, the crystalline quality of the resulting CdTe epilayers improved significantly with the increase of kinetic energy of the CdTe clusters. The best CdTe epilayer obtained exhibited a CdTe(400) double crystal rocking curve (DCRC) having a FWHM of 630 arc sec. (orig.).

  6. Effect of CdCl2 treatment on structural and electronic property of CdTe thin films deposited by magnetron sputtering

    International Nuclear Information System (INIS)

    The structural and electrical properties of the magnetron sputtered CdTe thin films with subsequent CdCl2 solution treatment have been studied with a major focus on the influence of CdCl2 treatment to achieve high quality thin films. In this study, CdTe films with a thickness of 1.5 to 2 μm have been grown using the magnetron sputtering technique on top of glass substrate at an optimized substrate temperature of 250 °C. Aqueous CdCl2 concentration varied from 0.3 mol to 1.2 mol with the annealing temperature from 360 °C to 450 °C. The surface roughness of the films increases with the increase of solution concentration, while it fluctuates with the increase of annealing temperature. The density of nucleation centers and the strain increases for the films treated at 360 °C with 0.3 M to1.2 M while the grain growth of the films reduces. However, these strains are released at higher annealing temperatures, resulting in reduced dislocation densities, structural defects as well as increased crystalline property and grain size. The carrier concentration increases with the increase of treated CdCl2 concentration and subsequent annealing temperature. The highest carrier concentration of 1.05 × 1014/cm3 was found for the CdTe thin films treated with 0.3 M CdCl2 solution followed by an annealing treatment at 420 °C for 20 min. - Highlights: • CdTe thin films are grown as absorption layers in CdTe solar cells by sputtering. • CdTe film quality in terms of structural and electronic properties is examined. • All growth parameters are optimized in the range of 1.5 to 2 μm CdTe films

  7. Effect of CdCl{sub 2} treatment on structural and electronic property of CdTe thin films deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Islam, M.A. [Solar Energy Research Institute (SERI), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Hossain, M.S.; Aliyu, M.M. [Department of Electrical, Electronic and Systems Engineering, Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Karim, M.R. [Center of Excellence for Research in Engineering Materials (CEREM) College of Engineering, King Saud University, Riyadh, 11421 (Saudi Arabia); Razykov, T.; Sopian, K. [Solar Energy Research Institute (SERI), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Amin, N., E-mail: nowshad@eng.ukm.my [Solar Energy Research Institute (SERI), Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Department of Electrical, Electronic and Systems Engineering, Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor (Malaysia); Center of Excellence for Research in Engineering Materials (CEREM) College of Engineering, King Saud University, Riyadh, 11421 (Saudi Arabia)

    2013-11-01

    The structural and electrical properties of the magnetron sputtered CdTe thin films with subsequent CdCl{sub 2} solution treatment have been studied with a major focus on the influence of CdCl{sub 2} treatment to achieve high quality thin films. In this study, CdTe films with a thickness of 1.5 to 2 μm have been grown using the magnetron sputtering technique on top of glass substrate at an optimized substrate temperature of 250 °C. Aqueous CdCl{sub 2} concentration varied from 0.3 mol to 1.2 mol with the annealing temperature from 360 °C to 450 °C. The surface roughness of the films increases with the increase of solution concentration, while it fluctuates with the increase of annealing temperature. The density of nucleation centers and the strain increases for the films treated at 360 °C with 0.3 M to1.2 M while the grain growth of the films reduces. However, these strains are released at higher annealing temperatures, resulting in reduced dislocation densities, structural defects as well as increased crystalline property and grain size. The carrier concentration increases with the increase of treated CdCl{sub 2} concentration and subsequent annealing temperature. The highest carrier concentration of 1.05 × 10{sup 14}/cm{sup 3} was found for the CdTe thin films treated with 0.3 M CdCl{sub 2} solution followed by an annealing treatment at 420 °C for 20 min. - Highlights: • CdTe thin films are grown as absorption layers in CdTe solar cells by sputtering. • CdTe film quality in terms of structural and electronic properties is examined. • All growth parameters are optimized in the range of 1.5 to 2 μm CdTe films.

  8. Preparation and characterization of pulsed laser deposited a novel CdS/CdSe composite window layer for CdTe thin film solar cell

    Science.gov (United States)

    Yang, Xiaoyan; Liu, Bo; Li, Bing; Zhang, Jingquan; Li, Wei; Wu, Lili; Feng, Lianghuan

    2016-03-01

    A novel CdS/CdSe composite window structure was designed and then the corresponding films were prepared by pulsed laser deposition as an improved window layer for CdTe-based solar cells. Two types of this composite window structure with 5 cycles and 10 cycles CdS/CdSe respectively both combined with CdS layers were prepared at 200 °C compared with pure CdS window layer and finally were applied into CdTe thin film solar cells. The cross section and surface morphology of the two composite window layers were monitored by using scanning electron microscopy and the result shows that the pulsed laser deposited composite window layers with good crystallinity are stacking together as the design. The devices based on CdS/CdSe composite window layers have demonstrated the enhanced photocurrent collection from both short and long wavelength regions compared to CdS/CdTe solar cell. The efficiency of the best reference CdS/CdTe solar cell was 10.72%. And the device with 5 cycles CdS/CdSe composite window showed efficiency of 12.61% with VOC of 772.92 mV, JSC of 25.11 mA/cm2 and FF of 64.95%. In addition, there are some differences which exist within the optical transmittance spectra and QE curves between the two CdS/CdSe composite window samples, indicating that the volume proportion of CdSe may influence the performance of CdTe thin film solar cell.

  9. Doping studies of spray-deposited CdTe films. [CdTe:In; CdTe:Na

    Energy Technology Data Exchange (ETDEWEB)

    Berry, A.K. (Electrical and Computer Engineering Dept., George Mason Univ., Fairfax, VA (USA))

    1991-04-01

    The results of doping spray-deposited cadmium telluride films on glass substrates are reported. The films were 1-4 {mu}m thick, displayed excellent adhesion to the substrate and possessed good surface morphology. The doping was achieved by incorporating the dopant source into the spraying solution. The films doped with indium and sodium show a decrease in resistivity by a factor of 100 with respect to the resistivity of undoped films grown under similar conditions. Attempts to dope with caesium and phosphorus were not satisfactory. Transport measurements were performed and they were found to be influenced significantly by the built-in potential at the grain boundaries. (orig.).

  10. Quantized Nanocrystalline CdTe Thin Films

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    Nanocrystalline CdTe thin films were prepared by asymmetric rectangular pulse electrodeposition in organic solution at 110°C. STM image shows a porous network morphology constructed by interconnected spherical CdTe crystallites with a mean diameter of 4.2 nm. A pronounced size quantization was indicated in the action and absorption spectra. Potentials dependence dual conductive behavior was revealed in the photocurrent-potential (I-V) curves.

  11. Growth of CdTe: Al films; Crecimiento de peliculas de CdTe: Al

    Energy Technology Data Exchange (ETDEWEB)

    Gonzalez A, M.; Zapata T, M. [CICATA-IPN, 89600 Altamira, Tamaulipas (Mexico); Melendez L, M. [CINVESTAV-IPN, A.P. 14-740, 07000 Mexico D.F. (Mexico); Pena, J.L. [CINVESTAV-IPN, A.P. 73 Cordemex, 97310 Merida, Yucatan (Mexico)

    2006-07-01

    CdTe: AI films were grown by the close space vapor transport technique combined with free evaporation (CSVT-FE). The Aluminum (Al) evaporation was made by two kinds of sources: one made of graphite and the other of tantalum. The films were deposited on glass substrates. The Al source temperature was varied maintaining the CdTe source temperature fixed as well as the substrate temperature. The films were characterized by x-ray energy dispersive analysis (EDAX), x-ray diffraction and optical transmission. The results showed for the films grown with the graphite source for Al evaporation, the Al did not incorporate in the CdTe matrix, at least to the level of EDAX sensitivity; they maintained the same crystal structure and band gap. For the samples grown with the tantalum source, we were able to incorporate the Al. The x-ray diffraction patterns show that the films have a crystal structure that depends on Al concentration. They were cubic up to 2.16 at. % Al concentration; for 19.65 at. % we found a mixed phase; for Al concentration higher than 21 at. % the films were amorphous. For samples with cubic structure it was found that the lattice parameter decreases and the band gap increases with Al concentration. (Author)

  12. Thin-film CdTe cells: Reducing the CdTe

    International Nuclear Information System (INIS)

    Polycrystalline thin-film CdTe is currently the dominant thin-film technology in world-wide PV manufacturing. With finite Te resources world-wide, it is appropriate to consider the limits to reducing the thickness of the CdTe layer in these devices. In our laboratory we have emphasized the use of magnetron sputtering for both CdS and CdTe achieving AM1.5 efficiency over 13% on 3 mm soda-lime glass with commercial TCO and 14% on 1 mm aluminosilicate glass. This deposition technique is well suited to good control of very thin layers and yields relatively small grain size which also facilitates high performance with ultra-thin layers. This paper describes our magnetron sputtering studies for fabrication of very thin CdTe cells. Our thinnest cells had CdTe thicknesses of 1 μm, 0.5 μm and 0.3 μm and yielded efficiencies of 12%, 9.7% and 6.8% respectively. With thinner cells Voc, FF and Jsc are reduced. Current-voltage (J-V), temperature dependent J-V (J-V-T) and apparent quantum efficiency (AQE) measurements provide valuable information for understanding and optimizing cell performance. We find that the stability under light soak appears not to depend on CdTe thickness from 2.5 to 0.5 μm. The use of semitransparent back contacts allows the study of bifacial response which is particularly useful in understanding carrier collection in the very thin devices.

  13. Structural and optical characterization of CdTe quantum dots thin films

    International Nuclear Information System (INIS)

    Highlights: • CdTe QDs are prepared by hot injection method. • Thermally evaporated CdTeQDs thin films were prepared. • Structural characterization and analysis were done. • Optical parameters were studied. - Abstract: Cadmium telluride quantum dots (CdTe QDs) have been synthesized using hot-injection chemical technique. The CdTe QDs thin films were deposited onto optical flat fused quartz substrates using thermal evaporation technique. The CdTe QDs powder and the as deposited films were characterized using X-ray diffraction and high resolution transmission electron microscope (HRTEM). The X-ray analysis shows that both CdTe QDs powder and the as deposited films crystallize in cubic zinc-blende type structure with lattice parameter 6.46 Å and 6.45 Å, respectively. The X-ray calculation shows that the average crystallite size of the as deposited CdTe QDs films varied from 1.1 nm for the powder to 2.3 nm for the thin film. The HRTEM examination of the as deposited films shows that the average particle size vary from 2.5 nm for the powder to 2.7 nm for the thin film. For the as deposited films, the dependence of (αhν)2 on the incident photon energy indicates that the optical transitions within the film are allowed direct with energies observed at Eg1≅2eV and Eg2≅2.3eV which attributed to quantum confinement effect. The optical band gap increases from 1.5 eV for microstructure CdTe to 2 eV for nanostructure quantum dots which corresponding to wavelength(620 nm) so it is a great benefit to use CdTe quantum dots as solar harvesting devices application in solar spectrum region (400–800 nm). Urbach energy is calculated and found to be 360 meV which is higher than microstructure CdTe. The refractive index and refractive index dispersion of the as deposited CdTe QDs film has been calculated from transmission and reflection spectra. It has been found that the refractive index is reduced from (2.66) for microstructure CdTe to be (1.7) for CdTe quantum dots

  14. Properties of CdTe nanocrystalline thin films grown on different substrates by low temperature sputtering

    Institute of Scientific and Technical Information of China (English)

    Chen Huimin; Guo Fuqiang; Zhang Baohua

    2009-01-01

    CdTe nanocrystalline thin films have been prepared on glass, Si and Al2O3 substrates by radio-frequency magnetron sputtering at liquid nitrogen temperature. The crystal structure and morphology of the films were characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM). The XRD examinations revealed that CdTe films on glass and Si had a better crystal quality and higher preferential orientation along the (111) plane than the Al2O3. FESEM observations revealed a continuous and dense morphology of CdTe films on glass and Si substrates. Optical properties of nanocrystalline CdTe films deposited on glass substrates for different deposited times were studied.

  15. Aluminum doping of CdTe polycrystalline films starting from the heterostructure CdTe/Al

    OpenAIRE

    Becerril, M.; O. Vigil-Galán; G. Contreras-Puente; O. Zelaya-Angel

    2011-01-01

    Aluminum doped CdTe polycrystalline films were obtained from the heterostructure CdTe/Al/Corning glass. The aluminum was deposited by thermal vacuum evaporation and the CdTe by sputtering of a CdTe target. The aluminum was introduced into the lattice of the CdTe from a thermal annealed to the CdTe/Al/Corning glas heterostructure. The electrical, structural, nd optical properties were analyzed as a function of the Al concentrations. It found that when Al is incorporated, the electrical resisti...

  16. RF sputtering deposition of CdTe on GaAs substrate

    Science.gov (United States)

    Adamiec, Krzysztof; Rutkowski, Jaroslaw; Bednarek, S.; Michalski, E.

    1997-06-01

    The fabrication of HgCdTe IR detectors demands high-quality CdTe or CdZnTe substrates. Bulk CdTe tends to twin, therefore large single crystals are generally not available. This problem could be circumvented by growing CdTe epilayers on an alternative large area substrate. Several studies have been made on the growth of CdTe on different substrates such as InSb, GaAs, Si and sapphire by MOCVD and MBE techniques. We report the initial results for the growth of CdTe buffer films on GaAs (100) substrates by sputter epitaxy. This crystal was chosen as the substrate material because of its transparency to IR radiation and availability as large area wafers with high structural perfection. Epitaxial films of CdTe were deposited in a sputtering system with a base pressure of 2 X 10-4 Pa. The GaAs substrate was degreased, etched in standard solution, and mounted immediately on a cooper substrate holder in the system. The substrates were ion etched in the sputtering system to remove surface oxide. The CdTe films were deposited in a wide substrate temperature range from 50 to 450 degrees C. Film thickness ranged from 0.1 to 5 micrometers , and deposition rates from 1 to 5 micrometers /h. The orientations and crystalline quality epitaxial films were characterized by x-ray diffraction. The surface morphology and the cross section of the gown CdTe layers were investigated by Nomarski interference contrast microscope. The optical and the electrical properties of the epitaxial films were investigated too. Structural characterization reveals that crystalline quality is a function of temperature of substrates. The single-crystals films grown at 300 degrees C on GaAs showed a best surface morphology.

  17. Study of in situ CdCl{sub 2} treatment on CSS deposited CdTe films and CdS/CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Paulson, P.D.; Dutta, V. [Indian Inst. of Tech., New Delhi (India). Centre for Energy Studies

    2000-07-17

    Effect of in situ CdCl{sub 2} treatment on the morphological, structural and electrical properties of CdTe films as well as on solar cell characteristics of CdS/CdTe junction has been investigated. XRD measurements show that the presence of CdCl{sub 2} vapours induces left angle 111 right angle oriented growth in the CdTe films. CdCl{sub 2} concentration required for this oriented growth is found to be directly proportional to the substrate temperature. SEM measurements show enhanced grain growth in the presence of CdCl{sub 2}. Spectral response of the CdCl{sub 2} treated CdS/CdTe solar cells shows an enhanced CdS diffusion in to the CdTe, which results in an improved spectral response in UV range and a consequent reduction in the interface states density. A drastic reduction in the deep levels due to the CdCl{sub 2} treatment, as seen in the photo-capacitance studies, has results in CdS/CdTe solar cells having efficiency >8%. (orig.)

  18. The Role of Dopant Concentration on Conductivity and Mobility of CdTe Thin Films

    Directory of Open Access Journals (Sweden)

    Ala J. Al-Douri

    2011-01-01

    Full Text Available Films of CdTe pure and doped with various atomic percentages of Al and Sb (0.5, 1.5 & 2.5 were prepared, and their electrical properties were investigated. The films were prepared by thermal evaporation on glass substrates at two substrate temperatures (Ts=RT & 423 K. The results showed that the conduction phenomena of all the investigated CdTe thin films on glass substrates are caused by two distinct mechanisms. Room temperature DC conductivity increases by a factor of four for undoped CdTe thin films as Ts increases and by 1-2 orders of magnitude with increasing dopant percentage of Al and Sb. In general, films doped with Sb are more efficient than Al-doped films. The activation energy (Ea2 decreases with increasing Ts and dopant percentage for both Al and Sb. Undoped CdTe films deposited at RT are p-type convert to n-type with increasing Ts and upon doping with Al at more than 0.5%. The carrier concentration decreases as Ts increases while it increases with increasing dopant percentage. Hall mobility decreases more than three times as Al increases whereas it increases about one order of magnitude with increasing Sb percentage in CdTe thin films deposited at 423 K and RT, respectively.

  19. CdTe deposition by successive ionic layer adsorption and reaction (SILAR) technique onto ZnO nanowires

    International Nuclear Information System (INIS)

    In this study is reported CdTe deposition by Successive Ionic Layer Adsorption and reaction (SILAR) at room temperature onto ZnO nanowires (NWs). The as-deposited CdTe layer exhibits poor crystalline quality and not well defined optical transition which is probably result of its amorphous nature. The implementation of an annealing step and chemical treatment by CdCl2 to the classical SILAR technique improved significantly the CdTe film quality. The XRD analysis showed that the as treated layers are crystallized in the cubic zinc blende structure. The full coverage of ZnO nanowires and thickness of the CdTe shell, composed of small crystallites, was confirmed by STEM and TEM analysis. The layer thickness could be controlled by the number of SILAR cycles. The sharper optical transitions for the annealed and CdCl2 treated heterostructures additionally proves the enhancement of the layer crystalline quality. For comparison CdTe was also deposited by close space sublimation (CSS) method onto ZnO nanowires. It is shown that the SILAR deposited CdTe exhibits equal crystalline and optical properties to that prepared by CSS. These results demonstrate that SILAR technique is more suitable for conformal thin film deposition on nanostructures. CdTe extremely thin film deposited by SILAR method onto ZnO nanowire. (copyright 2014 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  20. Synthesis of CdTe thin films on flexible metal foil by electrodeposition

    Science.gov (United States)

    Luo, H.; Ma, L. G.; Xie, W. M.; Wei, Z. L.; Gao, K. G.; Zhang, F. M.; Wu, X. S.

    2016-04-01

    CdTe thin films have been deposited onto the Mo foil from aqueous acidic bath via electrodeposition method with water-soluble Na2TeO3 instead of the usually used TeO2. X-ray diffraction studies indicate that the CdTe thin films are crystallized in zinc-blende symmetry. The effect of tellurite concentration on the morphology of the deposited thin film is investigated. In such case, the Cd:Te molar ratios in the films are both stoichiometric at different tellurite concentrations. In addition, the reduction in tellurite concentration leads to the porous thin film and weakens the crystallinity of thin film. The island growth model is used to interpret the growth mechanism of CdTe. The bandgap of the CdTe thin films is assigned to be 1.49 eV from the UV-Vis spectroscopy measurement, which is considered to serve as a promising candidate for the heterojunction solar cells.

  1. Synthesis of CdTe thin films on flexible metal foil by electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Luo, H.; Ma, L.G.; Xie, W.M.; Wei, Z.L.; Gao, K.G.; Zhang, F.M.; Wu, X.S. [Nanjing University, Collaborative Innovation Center of Advanced Microstructures, Lab of Solid State Microstructures, School of Physics, Nanjing (China)

    2016-04-15

    CdTe thin films have been deposited onto the Mo foil from aqueous acidic bath via electrodeposition method with water-soluble Na{sub 2}TeO{sub 3} instead of the usually used TeO{sub 2}. X-ray diffraction studies indicate that the CdTe thin films are crystallized in zinc-blende symmetry. The effect of tellurite concentration on the morphology of the deposited thin film is investigated. In such case, the Cd:Te molar ratios in the films are both stoichiometric at different tellurite concentrations. In addition, the reduction in tellurite concentration leads to the porous thin film and weakens the crystallinity of thin film. The island growth model is used to interpret the growth mechanism of CdTe. The bandgap of the CdTe thin films is assigned to be 1.49 eV from the UV-Vis spectroscopy measurement, which is considered to serve as a promising candidate for the heterojunction solar cells. (orig.)

  2. CdTe thin film solar cells with reduced CdS film thickness

    International Nuclear Information System (INIS)

    A study was performed to reduce the CdS film thickness in CdTe thin film solar cells to minimize losses in quantum efficiency. Using close space sublimation deposition for CdS and CdTe a maximum efficiency of ∼ 9.5% was obtained with the standard CdS film thickness of ∼ 160 nm. Reduction of the film CdS thickness to less than 100 nm leads to poor cell performance with ∼ 5% efficiency, mainly due to a lower open circuit voltage. An alternative approach has been tested to reduce the CdS film thickness (∼ 80 nm) by depositing a CdS double layer. The first CdS layer was deposited at high substrate temperature in the range of 520-540 deg. C and the second CdS layer was deposited at low substrate temperature of ∼ 250 deg. C. The cell prepared using a CdS double layer show better performance with cell efficiency over 10%. Quantum efficiency measurement confirmed that the improvement in the device performance is due to the reduction in CdS film thickness. The effect of double layer structure on cell performance is also observed with chemical bath deposited CdS using fluorine doped SnO2 as substrate.

  3. The prospects of CdTe thin films as solar control coatings

    Energy Technology Data Exchange (ETDEWEB)

    Sebastian, P.J.; Sivaramakrishnan, V. (Thin Film Lab., Dept. of Physics, Indian Inst. of Tech., Madras (India))

    1991-07-15

    Solar control coating refers to solar radiation filters applied on glazings of buildings in tropical countries. CdTe thin films were studied in this regard for use as an effective solar control coating. The films were characterized with respect to the film parameters such as film thickness, substrate temperature and deposition rate. On calculating the solar control parameters of various films, it was observed that the solar control parameters of the films depend on the above film parameters. CdTe films were found to be a better solar control coating than the commercial metallic coatings and exhibit comparable characteristics with Cu{sub x}S and PbS films. (orig.).

  4. Studies of recrystallization of CdTe thin films after CdCl{sub 2} treatment

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H.R.; Al-Jassim, M.M.; Abulfotuh, F.A.; Levi, D.H.; Dippo, P.C.; Dhere, R.G.; Kazmerski, L.L. [National Renewable Energy Lab., Golden, CO (United States)

    1997-12-31

    CdTe thin films deposited by physical vapor deposition (PVD) and close-spaced sublimation (CSS) have been treated with CdCl{sub 2} at 350 and 400 C. Atomic force microscopy (AFM) analysis showed that the films started recrystallizing during the 350 C CdCl{sub 2} treatment. These results were confirmed by the presence of two lattice parameters, detected in X-ray diffraction (XRD) analysis. The PVD films treated at 400 C were completely recrystallized and grain growth was observed. The formation of Cd(S{sub 1{minus}x}Te{sub x}) alloy in these films was evidenced by the appearance of extra peaks close to the CdTe peaks in the diffraction patterns. No major changes were observed in the structural properties of CSS CdTe films treated at the same conditions. It was concluded that the effect of the CdCl{sub 2} treatment in the CdTe films is to promote recrystallization and grain growth, but only if enough lattice-strain energy is available (as is the case for PVD films). Time-resolved photoluminescence (TRPL) analysis showed, for PVD and CSS films, an increase in minority-carrier lifetime with the treatment, mainly at 400 C, probably due to elimination of deep levels within the band gap.

  5. Studies on optoelectronic properties of DC reactive magnetron sputtered CdTe thin films

    International Nuclear Information System (INIS)

    Cadmium telluride continues to be a leading candidate for the development of cost effective photovoltaics for terrestrial applications. In the present work two individual metallic targets of Cd and Te were used for the deposition of CdTe thin films on mica substrates from room temperature to 300 °C by DC reactive magnetron sputtering method. XRD patterns of CdTe thin films deposited on mica substrates exhibit peaks at 2θ = 27.7°, 46.1° and 54.6°, which corresponds to reflection on (1 1 1), (2 2 0) and (3 1 1) planes of CdTe cubic structure. The intensities of XRD patterns increases with the increase of substrate temperature upto 150 °C and then it decreases at higher substrate temperatures. The conductivity of CdTe thin films measured from four probe method increases with the increase of substrate temperature. The activation energies (ΔE) are found to be decrease with the increase of substrate temperature. The optical transmittance spectra of CdTe thin films deposited on mica have a clear interference pattern in the longer wavelength region. The films have good transparency (T > 85 %) exhibiting interference pattern in the spectral region between 1200 – 2500 nm. The optical band gap of CdTe thin films are found to be in the range of 1.48 – 1.57. The refractive index, n decreases with the increase of wavelength, λ. The value of n and k increases with the increase of substrate temperature

  6. Investigation of induced recrystallization and stress in close-spaced sublimated and radio-frequency magnetron sputtered CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H.R.; Dhere, R.G.; Al-Jassim, M.M.; Levi, D.H.; Kazmerski, L.L. [National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)

    1999-07-01

    We have induced recrystallization of small grain CdTe thin films deposited at low temperatures by close-spaced sublimation (CSS), using a standard CdCl{sub 2} annealing treatment. We also studied the changes in the physical properties of CdTe films deposited by radio-frequency magnetron sputtering after the same post-deposition processing. We demonstrated that the effects of CdCl{sub 2} on the physical properties of CdTe films are similar, and independent of the deposition method. The recrystallization process is linked directly to the grain size and stress in the films. These studies indicated the feasibility of using lower-temperature processes in fabricating efficient CSS CdTe solar cells. We believe that, after the optimization of the parameters of the chemical treatment, these films can attain a quality similar to CSS films grown using current standard conditions. {copyright} {ital 1999 American Vacuum Society.}

  7. Vapor transport deposition of large-area polycrystalline CdTe for radiation image sensor application

    International Nuclear Information System (INIS)

    Vapor transport deposition (VTD) process delivers saturated vapor to substrate, resulting in high-throughput and scalable process. In addition, VTD can maintain lower substrate temperature than close-spaced sublimation (CSS). The motivation of this work is to adopt several advantages of VTD for radiation image sensor application. Polycrystalline CdTe films were obtained on 300 mm x 300 mm indium tin oxide (ITO) coated glass. The polycrystalline CdTe film has columnar structure with average grain size of 3 μm ∝ 9 μm, which can be controlled by changing the substrate temperature. In order to analyze electrical and X-ray characteristics, ITO-CdTe-Al sandwich structured device was fabricated. Effective resistivity of the polycrystalline CdTe film was ∝1.4 x 109Ωcm. The device was operated under hole-collection mode. The responsivity and the μτ product estimated to be 6.8 μC/cm2R and 5.5 x 10-7 cm2/V. The VTD can be a process of choice for monolithic integration of CdTe thick film for radiation image sensor and CMOS/TFT circuitry. (copyright 2014 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  8. Facile method to prepare CdS nanostructure based on the CdTe films

    International Nuclear Information System (INIS)

    Graphical abstract: - Highlights: • CdS nanostructure is directly fabricated on CdTe film only by heating treatment under H2S/N2 mixed atmosphere at a relatively low temperature (450 °C) with gold layer as the intermediate. • Nanostructure of CdS layer, varying from nanowires to nanosheets, may be controlled by the thickness of gold film. • The change of morphology adjusts its luminescence properties. - Abstract: Nanostructured cadmium sulfide (CdS) plays critical roles in electronics and optoelectronics. In this paper, we report a method to fabricate CdS nanostructure directly on CdTe film, via a thermal annealing method in H2S/N2 mixed gas flow at a relatively low temperature (450 °C). The microstructure and optical properties of CdS nanostructure are investigated by X-ray diffraction, transmission electron microscopy, Raman, and photoluminescence. The morphology of CdS nanostructure, evolving from nanowires to nanosheets, can be controlled by the thickness of Au film deposited on the CdTe film. And CdS nanostructures are single crystalline with the hexagonal wurtzite structure. Raman spectroscopy under varying the excitation wavelengths confirm that synthesized CdS-CdTe films contain two layers, i.e., CdS nanostructure (top) and CdTe layer (bottom). The change of morphology modifies its luminescence properties. Obviously, through simply thermal annealing in H2S/N2 mixed gas, fabricating CdS nanostructure on CdTe film can open up the new possibility for obtaining high efficient CdTe solar cell

  9. Facile method to prepare CdS nanostructure based on the CdTe films

    Energy Technology Data Exchange (ETDEWEB)

    Ma, Ligang; Chen, Yuehui; Wei, Zelu; Cai, Hongling; Zhang, Fengming; Wu, Xiaoshan, E-mail: xswu@nju.edu.cn

    2015-09-15

    Graphical abstract: - Highlights: • CdS nanostructure is directly fabricated on CdTe film only by heating treatment under H{sub 2}S/N{sub 2} mixed atmosphere at a relatively low temperature (450 °C) with gold layer as the intermediate. • Nanostructure of CdS layer, varying from nanowires to nanosheets, may be controlled by the thickness of gold film. • The change of morphology adjusts its luminescence properties. - Abstract: Nanostructured cadmium sulfide (CdS) plays critical roles in electronics and optoelectronics. In this paper, we report a method to fabricate CdS nanostructure directly on CdTe film, via a thermal annealing method in H{sub 2}S/N{sub 2} mixed gas flow at a relatively low temperature (450 °C). The microstructure and optical properties of CdS nanostructure are investigated by X-ray diffraction, transmission electron microscopy, Raman, and photoluminescence. The morphology of CdS nanostructure, evolving from nanowires to nanosheets, can be controlled by the thickness of Au film deposited on the CdTe film. And CdS nanostructures are single crystalline with the hexagonal wurtzite structure. Raman spectroscopy under varying the excitation wavelengths confirm that synthesized CdS-CdTe films contain two layers, i.e., CdS nanostructure (top) and CdTe layer (bottom). The change of morphology modifies its luminescence properties. Obviously, through simply thermal annealing in H{sub 2}S/N{sub 2} mixed gas, fabricating CdS nanostructure on CdTe film can open up the new possibility for obtaining high efficient CdTe solar cell.

  10. Optical Properties of Al- and Sb-Doped CdTe Thin Films

    Directory of Open Access Journals (Sweden)

    A. A. J. Al-Douri

    2010-01-01

    Full Text Available Nondoped and (Al, Sb-doped CdTe thin films with 0.5, 1.5, and 2.5  wt.%, respectively, were deposited by thermal evaporation technique under vacuum onto Corning 7059 glass at substrate temperatures ( of room temperature (RT and 423 K. The optical properties of deposited CdTe films such as band gap, refractive index (n, extinction coefficient (, and dielectric coefficients were investigated as function of Al and Sb wt.% doping, respectively. The results showed that films have direct optical transition. Increasing and the wt.% of both types of dopant, the band gap decrease but the optical is constant as n, and real and imaginary parts of the dielectric coefficient increase.

  11. Preparation and characterisation of nearly stoichiometric CdTe films from a non-aqueous electrodeposition bath

    Science.gov (United States)

    Gore, R. B.; Pandey, Rajendra Kumar; Kumar, S. R.

    1991-06-01

    The cathodic polarisation characteristics and the growth behaviour of CdTe films in an ethylene-glycol-based bath have been studied. Conditions favouring stoichiometric deposition have been examined. The influence of the processing variables on the film properties has also been discussed with the help of the XRD, SEM and XPS studies. It has been shown that the films deposited potentiostatically at -0.8 V are stoichiometric and single phase.

  12. Design of a thin film CdTe solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Meyers, P.V.

    1988-01-15

    Cadmium telluride was originally considered for thin film solar cells because of its optimum band gap, high optical absorption coefficient and ability to be doped. Furthermore, it is a stable compound which can be produced by a wide variety of methods from stable raw materials. As thin film photovoltaics mature, however, it is clear that several more subtle attributes have a significant impact on the viability of commercialization. We discuss the observations which have provided insight and direction to Ametek's CdTe solar cell program. Rather than try to modify the inherent material properties of CdTe, advances have been made by designing a solar cell that exploits existing properties. Specifically, the tendency to self-compensate, which makes low resistance contacting difficult, is turned into an advantage in the n-i-p configuration; the CdTe provides an intrinsic layer with good carrier collection efficiency.

  13. CdTe钝化介质膜的溅射沉积及其X射线光电子能谱研究%The Sputtering Deposition and the X-ray Photoelectron Spectroscopy Study for the CdTe Thin Film

    Institute of Scientific and Technical Information of China (English)

    周咏东; 李言谨; 吴小山; 徐国森; 方家熊; 汤定元

    2001-01-01

    用Ar+束溅射沉积技术实现了CdTe薄膜的低温沉积生长。用X射线光电子能谱(XPS)分析技术对溅射沉积CdTe薄膜以及CdTe体晶中的Cd元素、Te元素化学环境进行了对比实验研究。实验表明:溅射沉积CdTe薄膜具有很好的组份均匀性,未探测到有元素(Cd、Te)沉积存在。%The CdTe film was grown by using the low-temperature ion beam sputtering technique. The Cd and Te elements in the sputtering CdTe film sample were studied and compared with those in the CdTe bulk using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements in the sputtering CdTe film are homogeneous. No element deposition (Cd, Te) is detceted.

  14. Electro-Plating and Characterisation of CdTe Thin Films Using CdCl2 as the Cadmium Source

    Directory of Open Access Journals (Sweden)

    Nor A. Abdul-Manaf

    2015-09-01

    Full Text Available Cadmium telluride (CdTe thin films have been successfully prepared from an aqueous electrolyte bath containing cadmium chloride (CdCl2·H2O and tellurium dioxide (TeO2 using an electrodeposition technique. The structural, electrical, morphological and optical properties of these thin films have been characterised using X-ray diffraction (XRD, Raman spectroscopy, optical profilometry, DC current-voltage (I-V measurements, photoelectrochemical (PEC cell measurement, scanning electron microscopy (SEM, atomic force microscopy (AFM and UV-Vis spectrophotometry. It is observed that the best cathodic potential is 698 mV with respect to standard calomel electrode (SCE in a three electrode system. Structural analysis using XRD shows polycrystalline crystal structure in the as-deposited CdTe thin films and the peaks intensity increase after CdCl2 treatment. PEC cell measurements show the possibility of growing p-, i- and n-type CdTe layers by varying the growth potential during electrodeposition. The electrical resistivity of the as-deposited layers are in the order of 104 Ω·cm. SEM and AFM show that the CdCl2 treated samples are more roughness and have larger grain size when compared to CdTe grown by CdSO4 precursor. Results obtained from the optical absorption reveal that the bandgap of as-deposited CdTe (1.48–1.52 eV reduce to (1.45–1.49 eV after CdCl2 treatment. Full characterisation of this material is providing new information on crucial CdCl2 treatment of CdTe thin films due to its built-in CdCl2 treatment during the material growth. The work is progressing to fabricate solar cells with this material and compare with CdTe thin films grown by conventional sulphate precursors.

  15. Electron transient transport in CdTe polycrystalline films

    Science.gov (United States)

    Ramírez-Bon, R.; Sánchez-Sinencio, F.; González de la Cruz, G.; Zelaya, O.

    1991-11-01

    Electron transient currents between coplanar electrodes have been measured in intrinsic polycrystalline films of CdTe, by means of the time of flight technique. The experimental results: electron transient current vs time, transit time vs voltage and the temperature dependence of the electron drift mobility, show features characteristics of dispersive electrical transport similar to that observed in disordered solids.

  16. Photo-responsivity characterizations of CdTe films for direct-conversion X-ray detectors

    International Nuclear Information System (INIS)

    We have fabricated and investigated thin, polycrystalline, cadmium-telluride (CdTe) films in order to utilize them for optical switching readout layers in direct-conversion X-ray detectors. The polycrystalline CdTe films are fabricated on ITO glasses by using the physical vapor deposition (PVD) method at a slow deposition rate and a pressure of 10-6 torr. CdTe films with thicknesses of 5 and 20 μm are grown. The electrical and the optical characteristics of the CdTe films are investigated by measuring the dark-current and the photo-current as functions of the applied field under different wavelengths of light. Higher photo-currents are generated at the longer wavelengths of light for the same applied voltage. When a higher electrical field is applied to the 20 μm-thick CdTe film, a higher dark-current, a higher photo-current, a larger number of charges, and a higher quantum efficiency are generated.

  17. A Comparative Study on the Optical Properties of Multilayer CdSe / CdTe Thin Film with Single Layer CdTe and CdSe Films

    OpenAIRE

    M. Melvin David Kumar; Suganthi Devadason

    2013-01-01

    CdTe and CdSe single layer thin films and CdSe / CdTe multilayer (ML) thin film were prepared by using physical vapour deposition method. Optical properties of CdSe / CdTe multilayer thin film shows different behavior due to type II band structure alignment. Energy band gap value of CdSe / CdTe ML thin film is shifted to higher value than that of single layer CdTe film. This is due to decrease in crystallite size to dimension smaller than the Bohr exciton radius of CdTe (14 nm). Crystallite ...

  18. Effect of active treatments on photovoltaic characteristics of structures based on CdTe films

    International Nuclear Information System (INIS)

    Photoelectric characteristics of ITO/CdTe structures fabricated by the thermal evaporation in vacuum followed by their deposition in a quasi closed volume have been studied before and after treatments of various kinds. Some specimens were subjected to a 'chloride' treatment, the others were annealed in air. Afterward, the specimens were treated in hydrogen plasma, and they were covered with a thin diamond-like carbon film. The 'chloride' treatment of ITO/CdTe structures is shown to result in an increase of the diffusion length of charge carriers in the CdTe layer. The thermal annealing did not affect this parameter, but significantly enhanced the photosensitivity, which means a reduction of the surface recombination rate in the surface CdTe layer. For all considered ITO/CdTe structures obtained by the thermal evaporation in vacuum, the following treatment in hydrogen plasma and the deposition of thin diamondlike films brought about a substantial increase in the diffusion length of charge carriers in the CdTe layer. The ITO/CdTe structures obtained by the thermal vacuum evaporation and treated with hydrogen plasma demonstrated a significant enhancement of their spectral sensitivity in a wavelength range of 400-800 nm, whereas the same effect for structures subjected to the 'chloride' treatment was obtained after the sequential hydrogen plasma treatment and the diamond-like carbon film deposition.

  19. Preparation and Properties of CdTe Polycrystalline Films for Solar Cells

    Institute of Scientific and Technical Information of China (English)

    ZHENG Huajing; ZHANG Jingquan; FENG Lianghuan; ZHENG Jiagui; CAI Wei; LI Bing; CAI Yaping

    2006-01-01

    The structure and characteristics of CdTe thin films are closely dependent on the whole deposition process in close-space sublimation (CSS). The physical mechanism of CSS was analyzed and the temperature distribution in CSS system was measured, and the influences of the increasing-temperature process and pressure on the preliminary nucleus creation were studied. The results indicate: the samples deposited at different pressures have a cubical structure of CdTe and the diffraction peaks of CdS and SnO2∶F. As the atmosphere pressure increases, the crystal size of CdTe decreases, the rate of the transparency of the thin film decreases and the absorption side moves towards the short-wave direction. After a 4-minute depositing process with a substrate temperature of 500 ℃ and a source temperature of 620 ℃, the polycrystalline thin films can be made, so the production of high-quality integrated cell with SnO2:F/CdS/CdTe/Au structure is hopeful.

  20. Influence of CuxS back contact on CdTe thin film solar cells

    Institute of Scientific and Technical Information of China (English)

    Lei Zhi; Feng Lianghuan; Zeng Guanggen; Li Wei; Zhang Jingquan; Wu Lili; Wang Wenwu

    2013-01-01

    We present a detailed study on CuxS polycrystalline thin films prepared by chemical bath method and utilized as back contact material for CdTe solar cells.The characteristics of the films deposited on Si-substrate are studied by XRD.The results show that as-deposited CuxS thin film is in an amorphous phase while after annealing,samples are in polycrystalline phases with increasing temperature.The thickness of CuxS thin films has great impact on the performance of CdS/CdTe solar cells.When the thickness of the film is about 75 nm the performance of CdS/CdTe thin film solar cells is found to be the best.The energy conversion efficiency can be higher than 12.19%,the filling factor is higher than 68.82% and the open-circuit voltage is more than 820 mV.

  1. Preparation and properties of evaporated CdTe films compared with single crystal CdTe

    Science.gov (United States)

    Bube, R. H.

    The hot wall vacuum deposition system is discussed and is is good temperature tracking between the furnace core and the CdTe source itself are indicated. Homojunction cells prepared by HWVE deposition of n-CdTe on p-CdTe substrates show no significant change in dark or light properties after open circuit storage for the next 9 months. CdTe single crystal boules were grown with P, As and Cs impurity. For P impurity it appears that the segregation coefficient is close to unity, that the value of hole density is controlled by the P, and that growth with excess Cd gives slightly higher values of hole density than growth with excess Te. CdTe:As crystals appear similar to CdTe:P crystals.

  2. Substrate heating effect on the growth of a CdTe film on an InSb substrate by vacuum evaporation

    Science.gov (United States)

    Jiann-Ruey, Chen; Mau-Phon, Houng; Fenq-Lin, Jenq; Chien-Shyong, Fang; Wan-Sun, Tse

    1991-07-01

    Epitaxial CdTe thin films were grown on the (111) oriented InSb substrate by vacuum evaporation, with the substrate kept at 190-225°C during the film deposition. The chamber pressure during film deposition was at 3.5 × 10-6 mbar. X-ray diffraction was used to determine the film structure, while the full width at half maximum (FWHM) of the X-ray diffraction peak was used to examine the crystallinity of the as-deposited films. The film morphology was observed by the scanning electron microscope (SEM), and the film composition was determined by electron probe microanalysis (EPMA). The film quality was examined by infrared transmission spectroscopy. Results indicate that the quality of the grown CdTe films was improved with the higher substrate temperature during the film deposition.

  3. Thin film CdTe solar cells by close spaced sublimation: Recent results from pilot line

    International Nuclear Information System (INIS)

    CdTe is an attractive material to produce high efficient and low cost thin film solar cells. The semiconducting layers of this kind of solar cell can be deposited by the Close Spaced Sublimation (CSS) process. The advantages of this technique are high deposition rates and an excellent utilization of the raw material, leading to low production costs and competitive module prices. CTF Solar GmbH is offering equipment and process knowhow for the production of CdTe solar modules. For further improvement of the technology, research is done at a pilot line, which covers all relevant process steps for manufacture of CdTe solar cells. Herein, we present the latest results from the process development and our research activities on single functional layers as well as for complete solar cell devices. Efficiencies above 13% have already been obtained with Cu-free back contacts. An additional focus is set on different transparent conducting oxide materials for the front contact and a Sb2Te3 based back contact. - Highlights: ► Laboratory established on industrial level for CdTe solar cell research ► 13.0% cell efficiency with our standard front contact and Cu-free back contact ► Research on ZnO-based transparent conducting oxide and Sb2Te3 back contacts ► High resolution scanning electron microscopy analysis of ion polished cross section

  4. Physical properties of electron beam evaporated CdTe and CdTe:Cu thin films

    International Nuclear Information System (INIS)

    In this paper, we report on physical properties of pure and Cu doped cadmium telluride (CdTe) films deposited onto corning 7059 microscopic glass substrates by electron beam evaporation technique. X-ray diffraction study showed that all the deposited films belong to amorphous nature. The average transmittance of the films is varied between 77% and 90%. The optical energy band gap of pure CdTe film is 1.57 eV and it decreased to 1.47 eV upon 4 wt. % of Cu addition, which may be due to the extension of localized states in the band structure. The refractive index of the films was calculated using Swanepoel method. It was observed that the dispersion data obeyed the single oscillator of the Wemple-Didomenico model, from which the dispersion energy (Ed) parameters, dielectric constants, plasma frequency, and oscillator energy (Eo) of CdTe and CdTe:Cu films were calculated and discussed in detail with the light of possible mechanisms underlying the phenomena. The variation in intensity of photoluminescence band edge emission peak observed at 820 nm with Cu dopant is due to the change in surface state density. The observed trigonal lattice of Te peaks in the micro-Raman spectra confirms the p-type conductive nature of films, which was further corroborated by the Hall effect measurement. The lowest resistivity of 6.61 × 104 Ω cm was obtained for the CdTe:Cu (3 wt. %) film

  5. CdTe polycrystalline films on Ni foil substrates by screen printing and their photoelectric performance

    International Nuclear Information System (INIS)

    Highlights: • The sintered CdTe polycrystalline films by a simple screen printing. • The flexible Ni foil was chose as substrates to reduce the weight of the electrode. • The compact CdTe film was obtained at 550 °C sintering temperature. • The photoelectric activity of the CdTe polycrystalline films was excellent. - Abstract: CdTe polycrystalline films were prepared on flexible Ni foil substrates by sequential screen printing and sintering in a nitrogen atmosphere for the first time. The effect of temperature on the quality of the screen-printed film was investigated in our work. The high-quality CdTe films were obtained after sintering at 550 °C for 2 h. The properties of the sintered CdTe films were characterized by scanning electron microscopy, X-ray diffraction pattern and UV–visible spectroscopy. The high-quality CdTe films have the photocurrent was 2.04 mA/cm2, which is higher than that of samples prepared at other temperatures. Furthermore, CdCl2 treatment reduced the band gap of the CdTe film due to the larger grain size. The photocurrent of photoelectrode based on high crystalline CdTe polycrystalline films after CdCl2 treatment improved to 2.97 mA/cm2, indicating a potential application in photovoltaic devices

  6. CdTe polycrystalline films on Ni foil substrates by screen printing and their photoelectric performance

    Energy Technology Data Exchange (ETDEWEB)

    Yao, Huizhen [National Key Lab of Superhard Materials, Jilin University, Changchun 130012 (China); Ma, Jinwen [College of New Energy, Bohai University, Jinzhou, Liaoning 121013 (China); Mu, Yannan [National Key Lab of Superhard Materials, Jilin University, Changchun 130012 (China); Department of Physics and Chemistry, Heihe University, Heihe 164300 (China); Su, Shi; Lv, Pin; Zhang, Xiaoling; Zhou, Liying; Li, Xue; Liu, Li; Fu, Wuyou [National Key Lab of Superhard Materials, Jilin University, Changchun 130012 (China); Yang, Haibin, E-mail: yanghb@jlu.edu.cn [National Key Lab of Superhard Materials, Jilin University, Changchun 130012 (China)

    2015-06-15

    Highlights: • The sintered CdTe polycrystalline films by a simple screen printing. • The flexible Ni foil was chose as substrates to reduce the weight of the electrode. • The compact CdTe film was obtained at 550 °C sintering temperature. • The photoelectric activity of the CdTe polycrystalline films was excellent. - Abstract: CdTe polycrystalline films were prepared on flexible Ni foil substrates by sequential screen printing and sintering in a nitrogen atmosphere for the first time. The effect of temperature on the quality of the screen-printed film was investigated in our work. The high-quality CdTe films were obtained after sintering at 550 °C for 2 h. The properties of the sintered CdTe films were characterized by scanning electron microscopy, X-ray diffraction pattern and UV–visible spectroscopy. The high-quality CdTe films have the photocurrent was 2.04 mA/cm{sup 2}, which is higher than that of samples prepared at other temperatures. Furthermore, CdCl{sub 2} treatment reduced the band gap of the CdTe film due to the larger grain size. The photocurrent of photoelectrode based on high crystalline CdTe polycrystalline films after CdCl{sub 2} treatment improved to 2.97 mA/cm{sup 2}, indicating a potential application in photovoltaic devices.

  7. Impact of thermal annealing on optical properties of vacuum evaporated CdTe thin films for solar cells

    Science.gov (United States)

    Chander, Subhash; Purohit, A.; Lal, C.; Nehra, S. P.; Dhaka, M. S.

    2016-05-01

    In this paper, the impact of thermal annealing on optical properties of cadmium telluride (CdTe) thin films is investigated. The films of thickness 650 nm were deposited on thoroughly cleaned glass substrate employing vacuum evaporation followed by thermal annealing in the temperature range 250-450 °C. The as-deposited and annealed films were characterized using UV-Vis spectrophotometer. The optical band gap is found to be decreased from 1.88 eV to 1.48 eV with thermal annealing. The refractive index is found to be in the range 2.73-2.92 and observed to increase with annealing treatment. The experimental results reveal that the thermal annealing plays an important role to enhance the optical properties of CdTe thin films and annealed films may be used as absorber layer in CdTe/CdS solar cells.

  8. CdTe detector use for PIXE characterization of TbCoFe thin films

    International Nuclear Information System (INIS)

    Peltier cooled CdTe detectors have good efficiency beyond the range of energies normally covered by Si(Li) detectors, the most common detectors in PIXE applications. An important advantage of CdTe detectors is the possibility of studying K X-rays lines instead the L X-rays lines in various cases since CdTe detectors present an energy efficiency plateau reaching 70 keV or more. The ITN CdTe useful energy range starts at K-Kα (3.312 keV) and goes up to 120 keV, just above the energy of the lowest γ-ray of the 19F(p, p'γ)19F reaction. In the new ITN HRHE-PIXE line, a CdTe detector is associated to a POLARIS microcalorimeter X-ray detector built by Vericold Technologies GmbH (an Oxford Instruments Group Company). The ITN POLARIS has a resolution of 15 eV at 1.486 keV (Al-Kα) and 24 eV at 10.550 keV (Pb-Lα1). In the present work, a TbCoFe thin film deposited on a Si substrate was analysed at the HRHE-PIXE system. The good efficiency of the CdTe detector at 45 keV (Tb-Kα), and the excellent resolution of POLARIS microcalorimeter at 6.403 keV (Fe-Kα), are presented and the new possibilities open to the IBA analysis of systems with traditionally overlapping X-rays and near mass elements are discussed.

  9. Effect of film thickness on microstructure parameters and optical constants of CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Shaaban, E.R., E-mail: esam_ramadan2008@yahoo.co [Physics Department, Faculty of Science, Qassim University, Buridah 51452 (Saudi Arabia); Physics Department, Faculty of Science, Al-Azhar University, Assiut, P.O. 71452 (Egypt); Afify, N. [Physics Department, Assiut University, Assiut (Egypt); El-Taher, A. [Physics Department, Faculty of Science, Qassim University, Buridah 51452 (Saudi Arabia); Physics Department, Faculty of Science, Al-Azhar University, Assiut, P.O. 71452 (Egypt)

    2009-08-12

    Different thickness of cadmium telluride (CdTe) thin films was deposited onto glass substrates by the thermal evaporation technique. Their structural characteristics were studied by X-ray diffraction (XRD). The XRD experiments showed that the films are polycrystalline and have a zinc-blende (cubic) structure. The microstructure parameters, crystallite size and microstrain were calculated. It is observed that the crystallite size increases and microstrain decreases with the increase in the film thickness. The fundamental optical parameters like band gap and extinction coefficient are calculated in the strong absorption region of transmittance and reflectance spectrum. The possible optical transition in these films is found to be allowed direct transition with energy gap increase from 1.481 to 1.533 eV with the increase in the film thickness. It was found that the optical band gap increases with the increase in thickness. The refractive indices have been evaluated in transparent region in terms of envelope method, which has been suggested by Swanepoul in the transparent region. The refractive index can be extrapolated by Cauchy dispersion relationship over the whole spectral range, which extended from 400 to 2500 nm. It is observed that the refractive index, n increases on increasing the film thickness up to 671 nm and then the variation of n with higher thickness lie within the experimental errors.

  10. A Novel Method to Obtain Higher Deposition Rates of CdTe Using Low Temperature LPCVD for Surface Passivation of HgCdTe

    Science.gov (United States)

    Banerjee, Sneha; Dahal, Rajendra; Bhat, Ishwara B.

    2015-09-01

    The deposition rate of CdTe passivation films has been increased greatly by the implementation of a novel design of a graphite cracker cell. This cracker cell, consisting of an integrated diffuser, facilitates the efficient cracking of precursors. CdTe deposition rate has been increased from ~50 nm/h (without any cracker cell) to ~420 nm/h using this novel experimental set-up. H2 flow through the main gas flow line has been increased to obtain a progressive increase in deposition rates. CdTe deposited on high aspect ratio HgCdTe samples showed adequate conformal coverage on the side walls and also on the bottom of the trenches. Microwave photoconductive decay measurements were done on planar and patterned HgCdTe substrates at 77 K to extract the minority carrier lifetimes. There was a significant improvement in the lifetime of planar HgCdTe samples after CdTe passivation, though patterned HgCdTe samples showed a minor improvement. An additional annealing step was conducted at 250°C for 20 min in the presence of H2 after the deposition of CdTe passivation films. Minority carrier lifetimes improved further post-annealing, probably due to the formation of a graded interface between CdTe and HgCdTe.

  11. Characterization of Highly Efficient CdTe Thin Film Solar Cells by Low-Temperature Photoluminescence

    Science.gov (United States)

    Okamoto, Tamotsu; Matsuzaki, Yuichi; Amin, Nowshad; Yamada, Akira; Konagai, Makoto

    1998-07-01

    Highly efficient CdTe thin film solar cells prepared by close-spaced sublimation (CSS) method with a glass/ITO/CdS/CdTe/Cu-doped carbon/Ag structure were characterized by low-temperature photoluminescence (PL) measurement. A broad 1.42 eV band probably due to VCd Cl defect complexes appeared as a result of CdCl2 treatment. CdS/CdTe junction PL revealed that a CdSxTe1-x mixed crystal layer was formed at the CdS/CdTe interface region during the deposition of CdTe by CSS and that CdCl2 treatment promoted the formation of the mixed crystal layer. Furthermore, in the PL spectra of the heat-treated CdTe after screen printing of the Cu-doped carbon electrode, a neutral-acceptor bound exciton (ACu0, X) line at 1.590 eV was observed, suggesting that Cu atoms were incorporated into CdTe as effective acceptors after the heat treatment.

  12. Impact of thermal annealing on physical properties of vacuum evaporated polycrystalline CdTe thin films for solar cell applications

    Science.gov (United States)

    Chander, Subhash; Dhaka, M. S.

    2016-06-01

    A study on impact of post-deposition thermal annealing on the physical properties of CdTe thin films is undertaken in this paper. The thin films of thickness 500 nm were grown on ITO and glass substrates employing thermal vacuum evaporation followed by post-deposition thermal annealing in air atmosphere within low temperature range 150-350 °C. These films were subjected to the XRD, UV-Vis NIR spectrophotometer, source meter, SEM coupled with EDS and AFM for structural, optical, electrical and surface topographical analysis respectively. The diffraction patterns reveal that the films are having zinc-blende cubic structure with preferred orientation along (111) and polycrystalline in nature. The crystallographic parameters are calculated and discussed in detail. The optical band gap is found in the range 1.48-1.64 eV and observed to decrease with thermal annealing. The current-voltage characteristics show that the CdTe films exhibit linear ohmic behavior. The SEM studies show that the as-grown films are homogeneous, uniform and free from defects. The AFM studies reveal that the surface roughness of films is observed to increase with annealing. The experimental results reveal that the thermal annealing has significant impact on the physical properties of CdTe thin films and may be used as absorber layer to the CdTe/CdS thin films solar cells.

  13. RF magnetron sputtering deposition of CdTe passivation on HgCdTe

    Science.gov (United States)

    Rutkowski, Jaroslaw; Adamiec, Krzysztof; Rogalski, Antoni

    1998-04-01

    In this study, we report the RF magnetron sputtering growth and characterization of CdTe passivant on bulk n-type HgCdTe. Our investigations include the HgCdTe surface preparation and in-situ pretreatment, deposition-induced surface damage, interface charge, CdTe film stoichiometry, and thermal stability. The metal-insulator-semiconductor test structures are processed and their electrical properties are measured by capacitance-voltage characteristics. The heterostructures are also characterized by reflectance measurement. In order to investigate the passivation properties of CdTe/HgCdTe heterostructures, we have modeled the band diagram of abrupt CdTe/HgCdTe heterojunction. The effect of sputtering growth condition parameters is also reported. The sputtering CdTe layers, exhibit excellent dielectric, insulating and mechano- chemical properties, as well as interface properties. The interfaces are characterized by slight accumulation and a small hysteresis. A carefully controlled growth process and surface pretreatment tailored to the specific material are required in order to obtain near flat band conditions on n- type materials. Additional informations on surface limitations are obtained from analyzing the I-V characteristics of photodiodes with metal gates covering the p-n junction surface location.

  14. Conditions for the deposition of CdTe by electrochemical atomic layer epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Gregory, B.W.; Suggs, D.W.; Stickney, J.L. (School of Chemical Sciences, Univ. of Georgia, Athens, GA (US))

    1991-05-01

    In this paper the method of electrochemical atomic layer epitaxy (ECALE) is described. It involves the alternated electrochemical deposition of atomic layers of elements to form compound semiconductors. It is being investigated as a method for forming epitaxial thin films. Presently, it appears that the method is applicable to a wide range of compound semiconductors composed of a metal and one of the following main group elements: S, Se, Te, As, Sb, or Br. Initial studies have involved CdTe deposition. Factors controlling deposit structure and composition are discussed here. Preliminary results which show that ordered electrodeposits of CdTe can be formed by the ECALE method are also presented. Results reported here were obtained with both a polycrystalline Au thin-layer electrochemical cell and a single-crystal Au electrode with faces oriented to the (111), (110), and (100) planes. The single-crystal electrode was contained in a UHV surface analysis instrument with an integral electrochemical cell. Deposits were examined without their exposure to air using LEED and Auger electron spectroscopy. Coverages were determined using coulometry in the thin-layer electrochemical cell.

  15. Physical properties of Bi doped CdTe thin films grown by CSVT and their influence on the CdS/CdTe solar cells PV-properties

    Energy Technology Data Exchange (ETDEWEB)

    Vigil-Galan, O. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico)]. E-mail: osvaldo@esfm.ipn.mx; Sanchez-Meza, E. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Ruiz, C.M. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain); Sastre-Hernandez, J. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Morales-Acevedo, A. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); CINVESTAV-IPN, Electrical Engineering Department, Av. IPN No2508, C. P. 07360, Mexico, D. F. (Mexico); Cruz-Gandarilla, F. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Aguilar-Hernandez, J. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Saucedo, E. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain); Contreras-Puente, G. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Bermudez, V. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain)

    2007-05-31

    The physical properties of Bi doped CdTe films, grown on glass substrates by the Closed Space Transport Vapour (CSVT) method, from different Bi doped CdTe powders are presented. The CdTe:Bi films were characterized using Photoluminescence, Hall effect, X-Ray diffraction, SEM and Photoconductivity measurements. Moreover, CdS/CdTe:Bi solar cells were made and their characteristics like short circuit current density (J {sub sc}), open circuit voltage (V {sub OC}), fill factor (FF) and efficiency ({eta}) were determined. These devices were fabricated from Bi doped CdTe layers deposited on CdS with the same growth conditions than those used for the single CdTe:Bi layers. A correlation between the CdS/CdTe:Bi solar cell characteristics and the physical properties of the Bi doped CdTe thin films are presented and discussed.

  16. Effect of ZnO films on CdTe solar cells

    Institute of Scientific and Technical Information of China (English)

    Liu Tingliang; He Xulin; Zhang Jingquan; Feng Lianghuan; Wu Lili; Li Wei; Zeng Guanggen; Li Bing

    2012-01-01

    The ZnO high resistivity transparent (HRT) layers were prepared by DC magnetron sputtering on the 1mm borosilicate glass with 150 nm 1TO coating.The structural,optical and electrical properties of the as-deposited films were investigated by XRD,UV/Vis spectroscopy and four-probe technology.The interface characters of the ITO/ZnO and ZnO/CdS systems were studied by ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) depth profiling tests.The results show that ZnO has good optical and electrical properties.The insertion of the ZnO films decreases the energy barrier between ITO and CdS films.The energy conversion efficiency and quantum efficiency were found to be 12.77% (8.9%) and > 90% (79%) with or (without)ZnO films of CdTe solar cells.Furthermore,the effect of thickness,mobility and carrier density of ZnO films on CdTe solar cells was analyzed by AMPD-1D.

  17. Effect of ZnO films on CdTe solar cells

    International Nuclear Information System (INIS)

    The ZnO high resistivity transparent (HRT) layers were prepared by DC magnetron sputtering on the 1 mm borosilicate glass with 150 nm ITO coating. The structural, optical and electrical properties of the as-deposited films were investigated by XRD, UV/Vis spectroscopy and four-probe technology. The interface characters of the ITO/ZnO and ZnO/CdS systems were studied by ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) depth profiling tests. The results show that ZnO has good optical and electrical properties. The insertion of the ZnO films decreases the energy barrier between ITO and CdS films. The energy conversion efficiency and quantum efficiency were found to be 12.77% (8.9%) and > 90% (79%) with or (without) ZnO films of CdTe solar cells. Furthermore, the effect of thickness, mobility and carrier density of ZnO films on CdTe solar cells was analyzed by AMPD-1D. (semiconductor materials)

  18. SEM, EDS, PL and absorbance study of CdTe thin films grown by CSS method

    Energy Technology Data Exchange (ETDEWEB)

    Hernandez-Torres, M.E.; Silva-Gonzalez, R.; Gracia-Jimenez, J.M. [Instituto de Fisica, BUAP, Apdo. Postal J-48, San Manuel, 72570 Puebla, Pue. (Mexico); Casarrubias-Segura, G. [CIE- UNAM, 62580 Temixco, Morelos (Mexico)

    2006-09-22

    Oxygen-doped CdTe films were grown on conducting glass substrates by the close spaced sublimation (CSS) method and characterized using SEM, EDS, photoluminescence (PL) and absorbance. A significant change in the polycrystalline morphology is observed when the oxygen proportion is increased in the deposition atmosphere. The EDS analysis showed that all samples are nonstoichiometric with excess Te. The PL spectra show emission bands associated with Te vacancies (V{sub Te}), whose intensities decrease as the oxygen proportion in the CSS chamber is increased. The oxygen impurities occupy Te vacancies and modify the surfaces states, improving the nonradiative process. (author)

  19. Cu-doped CdS and its application in CdTe thin film solar cell

    Directory of Open Access Journals (Sweden)

    Yi Deng

    2016-01-01

    Full Text Available Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the VCd− and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl2 annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  20. Cu-doped CdS and its application in CdTe thin film solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Deng, Yi [School of Automation, Wuhan University of Technology, Wuhan, Hubei 430070 (China); College of Electronic and Information Engineering, Hankou University, Wuhan, Hubei 430212 (China); Yang, Jun; Yang, Ruilong; Shen, Kai; Wang, Dezhao [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026 (China); Wang, Deliang, E-mail: eedewang@ustc.edu.cn [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026 (China); Key Laboratory of Materials for Energy Conversion, University of Science and Technology of China, Hefei, Anhui 230026 (China)

    2016-01-15

    Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the V{sub Cd{sup −}} and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl{sub 2} annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  1. Cu-doped CdS and its application in CdTe thin film solar cell

    Science.gov (United States)

    Deng, Yi; Yang, Jun; Yang, Ruilong; Shen, Kai; Wang, Dezhao; Wang, Deliang

    2016-01-01

    Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the VCd- and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl2 annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  2. Cu-doped CdS and its application in CdTe thin film solar cell

    International Nuclear Information System (INIS)

    Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the VCd− and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl2 annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures

  3. [Spectral analyzing effects of atmosphere states on the structure and characteristics of CdTe polycrystalline thin films made by close-spaced sublimation].

    Science.gov (United States)

    Zheng, Hua-jing; Zheng, Jia-gui; Feng, Liang-huan; Zhang, Jing-quan; Xie, Er-qing

    2005-07-01

    The structure and characteristics of CdTe thin films are dependent on the working atmosphere states in close-spaced sublimation. In the present paper, CdTe polycrystalline thin films were deposited by CSS in mixture atmosphere of argon and oxygen. The physical mechanism of CSS was analyzed, and the temperature distribution in CSS system was measured. The dependence of preliminary nucleus creation on the atmosphere states (involving component and pressure) was studied. Transparencies were measured and optic energy gaps were calculated. The results show that: (1) The CdTe films deposited in different atmospheres are cubic structure. With increasing oxygen concentration, a increases and reaches the maximum at 6% oxygen concentration, then reduces, and increases again after passing the point at 12% oxygen concentration. Among them, the sample depositing at 9% oxygen concentration is the best. The optic energy gaps are 1.50-1.51 eV for all CdTe films. (2) The samples depositing at different pressures at 9% oxygen concentration are all cubical structure of CdTe, and the diffraction peaks of CdS and SnO2:F still appear. With the gas pressure increasing, the crystal size of CdTe minishes, the transparency of the thin film goes down, and the absorption side shifts to the short-wave direction. (3) The polycrystalline thin films with high quality deposit in 4 minutes under the depositing condition that the substrate temperature is 550 degrees C, and source temperature is 620 degrees C at 9% oxygen concentration. PMID:16241058

  4. About the use of photoacoustic spectroscopy for the optical characterization of semiconductor thin films: CdTe

    Energy Technology Data Exchange (ETDEWEB)

    Marin, E.; Calderon, A. [CICATA-IPN, Av. Legaria 694, 11500 Mexico D.F. (Mexico); Vigil G, O.; Sastre, J.; Contreras P, G.; Aguilar H, J. [ESFM-IPN, 07738 Mexico D.F. (Mexico); Saucedo, E.; Ruiz, C.M. [Departamento de Fisica de Materiales, Facultad de Ciencias, Universidad Autonoma de Madrid, 28049 Madrid (Spain)

    2006-07-01

    CdTe has been used satisfactorily in multiple and diverse technological applications such as detectors of X and gamma rays that operate at room temperature, for digital imagenology of X rays with medical and industrial applications and as active part in CdTe/CdS solar cells. In form of films, CdTe is generally grown with thicknesses ranging between 3 and 15 {mu}m, for which it is difficult to measure, by means of optical techniques, absorption coefficients greater than 10{sup 3} cm{sup -1} because nearly full absorption of light should occur below 800 nm. The exact determination of the optical absorption coefficient in detectors on the basis of CdTe is very important since this parameter determines the absorption length at which 90% of the photons with energies over the forbidden zone of the CdTe will be absorbed by this. In CdS/CdTe polycrystalline solar cells the greater efficiency of conversion have been reported for film thicknesses of 10 mm, however, the optimal value of this parameter depends strongly on the method and the variables of growth. The optical absorption coefficient spectrum can be determined by several methods, often involving several approximations and the knowledge of some minority carrier related electronic parameters that reduce their application in general way. In this work we propose to determine the absorption coefficient in CdTe thin films by photoacoustic spectroscopy (PAS), because this technique allow us to obtain the optical absorption spectra in thicker layers and therefore the study of the influence of the several growth and post-growth processes in the optical properties of this thin films. We measure by PAS the optical-absorption coefficients of CdTe thin films in the spectral region near the fundamental absorption edge ranging from 1.0 to 2.4 eV using an open cell in the transmission configuration. The films were deposited on different substrates by the CSVT-HW (hot wall) technique. In order to study the influence of several

  5. Advances in CuInSe sub 2 and CdTe thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Shafarmann, W.N.; Birkmire, R.W.; Farding, D.A.; McCandless, B.E.; Mondal, A.; Phillips, J.E.; Varrin, R.D. Jr. (Delaware Univ., Newark (USA). Inst. of Energy Conversion)

    1991-05-01

    Research on CuInSe{sub 2} and CdTe thin film solar cells is discussed. CuInSe{sub 2} was deposited by selenization of Cu/In layers and was used to make a 10% efficient CuInSe{sub 2}/(CdZn)S cell. Characterization of the reaction mechanisms is described. The open-circuit voltage V{sub oc} of CuInSe{sub 2}/(CdZn)S cells is dominated by recombination in the space charge region, so increassing the band gap or decreasing the width of this region should increase V{sub oc}. Increasing the band gap with a thin Cu(InGa)Se{sub 2} layer at the CuInSe{sub 2} surface has demonstrated increased V{sub oc} with collection out to the CuInSe{sub 2} band gap. A post-deposition treatment and contacting process for evaporated CdS/CdTe cells was developed and high efficiency cells were made. Several steps in the process, including a CdCl{sub 2} coating, a 400deg C heat treatment, and a contact containing copper are critical. ZnTe films were deposited from an aqueous solution as a contact to CdTe. (orig.).

  6. PENINGKATAN KUALITAS FILM TIPIS CdTe SEBAGAI ABSORBER SEL SURYA DENGAN MENGGUNAKAN DOPING TEMBAGA (Cu)

    OpenAIRE

    P. Marwoto; N.M. Darmaputra; Sugianto -; Othaman, Z.; E. Wibowo; S.Y. Astuti

    2012-01-01

    Film tipis CdTe dengan doping tembaga (Cu) berkonsenterasi 2% telah berhasil ditumbuhkan di atas substrat Indium Tin Oxide (ITO) dengan metode dc magnetron sputtering. Penelitian ini dilakukan untuk mengetahui pengaruh doping Cu(2%) terhadap struktur morfologi, struktur kristal, fotoluminisensi dan resistivitas listrik film CdTe. Citra morfologi Scanning Electron Microscopy (SEM) dan hasil analisis struktur dengan X-Ray Diffraction (XRD) menunjukkan bahwa film CdTe:Cu(2%) mempunyai citra perm...

  7. Flexible CdTe solar cells on polymer films

    Energy Technology Data Exchange (ETDEWEB)

    Tiwari, A.N.; Romeo, A.; Baetzner, D.; Zogg, H. [ETH Swiss Federal Inst. of Technology, Thin Film Physics Group, Zurich (Switzerland)

    2001-07-01

    Lightweight and flexible CdTe/CdS solar cells on polyimide films have been developed in a 'superstrate configuration' where the light is absorbed in CdTe after passing through the polyimide substrate. The average optical transmission of the approximately 10-{mu}m-thin spin-coated polyimide substrate layer is more than {approx}75% for wavelengths above 550 nm. RF magnetron sputtering was used to grow transparent conducting ZnO:Al layers on polyimide films. CdTe/CdS layers were grown by evaporation of compounds, and a CdCl{sub 2} annealing treatment was applied for the recrystallisation and junction activation. Solar cells of 8.6% efficiency with V{sub oc} = 763 mV, I{sub sc} = 20.3 mA/cm{sup 2} and FF = 55.7% were obtained. (Author)

  8. Effect of Annealing on the Properties of Antimony Telluride Thin Films and Their Applications in CdTe Solar Cells

    Directory of Open Access Journals (Sweden)

    Zhouling Wang

    2014-01-01

    Full Text Available Antimony telluride alloy thin films were deposited at room temperature by using the vacuum coevaporation method. The films were annealed at different temperatures in N2 ambient, and then the compositional, structural, and electrical properties of antimony telluride thin films were characterized by X-ray fluorescence, X-ray diffraction, differential thermal analysis, and Hall measurements. The results indicate that single phase antimony telluride existed when the annealing temperature was higher than 488 K. All thin films exhibited p-type conductivity with high carrier concentrations. Cell performance was greatly improved when the antimony telluride thin films were used as the back contact layer for CdTe thin film solar cells. The dark current voltage and capacitance voltage measurements were performed to investigate the formation of the back contacts for the cells with or without Sb2Te3 buffer layers. CdTe solar cells with the buffer layers can reduce the series resistance and eliminate the reverse junction between CdTe and metal electrodes.

  9. Nanocrystalline CdTe thin films by electrochemical synthesis

    Directory of Open Access Journals (Sweden)

    Ramesh S. Kapadnis

    2013-03-01

    Full Text Available Cadmium telluride thin films were deposited onto different substrates as copper, Fluorine-doped tin oxide (FTO, Indium tin oxide (ITO, Aluminum and zinc at room temperature via electrochemical route. The morphology of the film shows the nanostructures on the deposited surface of the films and their growth in vertical direction. Different nanostructures developed on different substrates. The X-ray diffraction study reveals that the deposited films are nanocrystalline in nature. UV-Visible absorption spectrum shows the wide range of absorption in the visible region. Energy-dispersive spectroscopy confirms the formation of cadmium telluride.

  10. Growth of CdTe thin films on graphene by close-spaced sublimation method

    International Nuclear Information System (INIS)

    CdTe thin films grown on bi-layer graphene were demonstrated by using the close-spaced sublimation method, where CdTe was selectively grown on the graphene. The density of the CdTe domains was increased with increasing the number of the defective sites in the graphene, which was controlled by the duration of UV exposure. The CdTe growth rate on the bi-layer graphene electrodes was 400 nm/min with a bandgap energy of 1.45–1.49 eV. Scanning electron microscopy, micro-Raman spectroscopy, micro-photoluminescence, and X-ray diffraction technique were used to confirm the high quality of the CdTe thin films grown on the graphene electrodes

  11. Characterization of Sputtered CdTe Thin Films with Electron Backscatter Diffraction and Correlation with Device Performance.

    Science.gov (United States)

    Nowell, Matthew M; Scarpulla, Michael A; Paudel, Naba R; Wieland, Kristopher A; Compaan, Alvin D; Liu, Xiangxin

    2015-08-01

    The performance of polycrystalline CdTe photovoltaic thin films is expected to depend on the grain boundary density and corresponding grain size of the film microstructure. However, the electrical performance of grain boundaries within these films is not well understood, and can be beneficial, harmful, or neutral in terms of film performance. Electron backscatter diffraction has been used to characterize the grain size, grain boundary structure, and crystallographic texture of sputtered CdTe at varying deposition pressures before and after CdCl2 treatment in order to correlate performance with microstructure. Weak fiber textures were observed in the as-deposited films, with (111) textures present at lower deposition pressures and (110) textures observed at higher deposition pressures. The CdCl2-treated samples exhibited significant grain recrystallization with a high fraction of twin boundaries. Good correlation of solar cell efficiency was observed with twin-corrected grain size while poor correlation was found if the twin boundaries were considered as grain boundaries in the grain size determination. This implies that the twin boundaries are neutral with respect to recombination and carrier transport. PMID:26077102

  12. Chemical structure of microcrystalline CdTe films grown by RF sputtering

    Science.gov (United States)

    Hernández-Calderón, I.; Jiménez-Sandoval, S.; Peña, J. L.; Sailer, V.

    1990-01-01

    We have applied X-ray photoemission and Auger spectroscopy techniques to the study of the stoichiometric properties of CdTe thin films grown by RF sputtering. The microcrystalline films were deposited on glass substrates held at temperatures between 50 and 200°C. They contain a mixture of the cubic (zinc-blende) and hexagonal (wurtzite) phases which are nearly stoichiometric. By using bulk and surface sensitive photoemission geometries it is shown that a tellurium oxide overlayer is always formed after exposure to air. A simple calculation shows that this overlayer is at most 10 Å thick. Cadmium seems to be insensitive to the presence of oxygen, as demonstrated by the absence of shifted Cd peaks in the X-ray spectra. It is shown that the low kinetic energy features in the Auger spectra ( oxide overlayer and contamination.

  13. Preparation and Properties of Evaporated CdTe and All Thin Film CdTe/CdS Solar Cells

    Science.gov (United States)

    Shahzad, Naseem

    1991-05-01

    Cadmium telluride thin films were prepared by vacuum evaporation of CdTe powder in an attempt to fabricate all thin film solar cells of the type CdTe/CdS. Characterization of CdTe has shown it to have a band gap of 1.522 eV and a resistivity of 22Ω-cm. As prepared, solar cells exhibited low values of output parameters. Given quantity of copper was then deposited on top of the CdTe/CdS solar cells and the whole system was annealed at 350° C. This copper doping changed the output parameters favorably with a maximum efficiency of 1.9%.

  14. Influence of thickness on physical properties of vacuum evaporated polycrystalline CdTe thin films for solar cell applications

    Science.gov (United States)

    Chander, Subhash; Dhaka, M. S.

    2016-02-01

    This paper presents the influence of thickness on physical properties of polycrystalline CdTe thin films. The thin films of thickness 450 nm, 650 nm and 850 nm were deposited employing thermal vacuum evaporation technique on glass and indium tin oxide (ITO) coated glass substrates. The physical properties of these as-grown thin films were investigated employing the X-ray diffraction (XRD), source meter, UV-Vis spectrophotometer, scanning electron microscopy (SEM) coupled with energy dispersive spectroscopy (EDS). The structural analysis reveals that the films have zinc-blende cubic structure and polycrystalline in nature with preferred orientation (111). The structural parameters like lattice constant, interplanar spacing, grain size, strain, dislocation density and number of crystallites per unit area are calculated. The average grain size and optical band gap are found in the range 15.16-21.22 nm and 1.44-1.63 eV respectively and observed to decrease with thickness. The current-voltage characteristics show that the electrical conductivity is observed to decrease with thickness. The surface morphology shows that films are free from crystal defects like pin holes and voids as well as homogeneous and uniform. The EDS patterns show the presence of cadmium and tellurium elements in the as grown films. The experimental results reveal that the film thickness plays significant role on the physical properties of as-grown CdTe thin films and higher thickness may be used as absorber layer to solar cells applications.

  15. Optical and structural characterization of oleic acid-stabilized CdTe nanocrystals for solution thin film processing

    OpenAIRE

    Claudio Davet Gutiérrez-Lazos; Mauricio Ortega-López; Pérez-Guzmán, Manuel A; A. Mauricio Espinoza-Rivas; Francisco Solís-Pomar; Rebeca Ortega-Amaya; L. Gerardo Silva-Vidaurri; Virginia C. Castro-Peña; Eduardo Pérez-Tijerina

    2014-01-01

    This work presents results of the optical and structural characterization of oleic acid-stabilized cadmium telluride nanocrystals (CdTe-NC) synthesized by an organometallic route. After being cleaned, the CdTe-NC were dispersed in toluene to obtain an ink-like dispersion, which was drop-cast on glass substrate to deposit a thin film. The CdTe-NC colloidal dispersion as well as the CdTe drop-cast thin films were characterized with regard to the optical and structural properties. TEM analysis i...

  16. Effective Ag doping by He-Ne laser exposure to improve the electrical and the optical properties of CdTe thin films for heterostructured thin film solar cells

    International Nuclear Information System (INIS)

    The cadmium telluride (CdTe) thin film solar cell is one of the strongest candidates due to the optimum band gap energy (about 1.4 eV) for solar energy absorption, high light absorption capability and lower cost requirements for solar cell production. However, the maximum efficiency of a CdTe thin film solar cell still remains just 16.5% despite its excellent absorption coefficient; i.e., the electrical properties of CdTe thin film, including the resistivity, must be improved to enhance the energy conversion efficiency. Silver (Ag) was doped by using helium-neon (He-Ne) laser (632.8 nm) exposure into sputtering-deposited p-type CdTe thin films. The resistivity of the Ag-doped CdTe thin films was reduced from 2.97 x 104 Ω-cm to the order of 5.16 x 10'-'2 Ω-cm. The carrier concentration of CdTe thin films had increased to 1.6 x 1018 cm-3 after a 15-minute exposure to the He-Ne laser. The average absorbance value of CdTe thin films was improved from 1.81 to 3.01 by the doping of Ag due to impurity-scattering. These improved properties should contribute to the efficiency of the photovoltaic effect of the photogenerated charged carriers. The methodology in this study is very simple and effective to dope a multilayered thin film solar cell with a relatively short process time, no wet-process, and selective treatment.

  17. PENINGKATAN KUALITAS FILM TIPIS CdTe SEBAGAI ABSORBER SEL SURYA DENGAN MENGGUNAKAN DOPING TEMBAGA (Cu

    Directory of Open Access Journals (Sweden)

    P. Marwoto

    2012-12-01

    Full Text Available Film tipis CdTe dengan doping tembaga (Cu berkonsenterasi 2% telah berhasil ditumbuhkan di atas substrat Indium Tin Oxide (ITO dengan metode dc magnetron sputtering. Penelitian ini dilakukan untuk mengetahui pengaruh doping Cu(2% terhadap struktur morfologi, struktur kristal, fotoluminisensi dan resistivitas listrik film CdTe. Citra morfologi Scanning Electron Microscopy (SEM dan hasil analisis struktur dengan X-Ray Diffraction (XRD menunjukkan bahwa film CdTe:Cu(2% mempunyai citra permukaan dan struktur kristal yang lebih sempurna dibandingkan film CdTe tanpa doping. Hasil analisis spektrometer fotoluminisensi menunjukkan bahwa film CdTe dan CdTe(2% mempunyai puncak fotoluminisensi pada tiga panjang gelombang yang identik yaitu 685 nm (1,81 eV, 725 nm (1,71 eV dan 740 nm (1,67 eV. Film CdTe dengan doping Cu(2% memiliki intensitas puncak fotoluminisensi yang lebih tajam pada pita energi 1,81 eV dibandingkan dengan film CdTe tanpa doping. Pengukuran arus dan tegangan (I-V menunjukkan bahwa pemberian doping Cu(2% dapat menurunkan resistivitas film dari 8,40x109 Ωcm menjadi 6,92x105 Ωcm. Sebagai absorber sel surya, kualitas film tipis CdTe telah berhasil ditingkatkan dengan pemberian doping Cu(2%.CdTe:Cu(2% thin film has been successfully grown on Indium Tin Oxide (ITO substrates by using dc magnetron sputtering. This study was carried out in order to investigate the effect of Cu(2% doping on the morphologycal structure, crystal structure, photoluminesence, and resistivity of CdTe thin film. Scanning Electron Microscopy (SEM  images and X-Ray Diffraction (XRD results showed that CdTe:Cu(2% thin film has morphologycal and crystal structures more perfect than undoped CdTe film. Photoluminesence spectroscopy results showed that CdTe and CdTe:Cu(2% thin films have luminesence peak at three identical wevelength regions i.e. 685 nm (1.81 eV, 725 nm (1.71 eV and 740 nm (1.67 eV however CdTe:Cu(2% film shows sharper photoluminescence peak at band

  18. On the doping problem of CdTe films: The bismuth case

    Energy Technology Data Exchange (ETDEWEB)

    Vigil-Galan, O. [Escuela Superior de Fisica y Matematicas del IPN, Edif. 9, UPALM, 07738 Mexico, D. F. (Mexico); Brown, M. [Department of Physics and Astronomy, The University of Toledo, 43606 Toledo, OH (United States); Ruiz, C.M. [Depto. Fisica de Materiales, Universidad Autonoma de Madrid, 28049 Madrid (Spain); Vidal-Borbolla, M.A. [Instituto de Investigacion en Comunicacion Optica, Av. Karakorum 1470, Lomas 4a. Secc., 78210 San Luis Potosi, SLP (Mexico); Ramirez-Bon, R. [CINVESTAV-IPN, U. Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico); Sanchez-Meza, E. [Escuela Superior de Fisica y Matematicas del IPN, Edif. 9, UPALM, 07738 Mexico, D. F. (Mexico); Tufino-Velazquez, M. [Escuela Superior de Fisica y Matematicas del IPN, Edif. 9, UPALM, 07738 Mexico, D. F. (Mexico)], E-mail: mtufinovel@yahoo.com.mx; Calixto, M. Estela [Escuela Superior de Fisica y Matematicas del IPN, Edif. 9, UPALM, 07738 Mexico, D. F. (Mexico); Compaan, A.D. [Department of Physics and Astronomy, The University of Toledo, 43606 Toledo, OH (United States); Contreras-Puente, G. [Escuela Superior de Fisica y Matematicas del IPN, Edif. 9, UPALM, 07738 Mexico, D. F. (Mexico)

    2008-08-30

    The controlled increase of hole concentration is an important issue and still an unsolved problem for polycrystalline CdTe-based solar cells. The typical hole concentration of as-grown CdTe thin-films goes up to 10{sup 13} cm{sup -3}, depending on the specific growth technique. The highest electron concentration obtained for CdS, the suitable window partner material of CdTe, is around 10{sup 15} cm{sup -3}. Thus, the PV-performance of a CdS/CdTe device can be optimized if the hole concentration in CdTe is increased. We have faced up this problem by studying the electrical properties of two types of CdTe films: CdTe films grown by Close Space Vapor Transport using a CdTe:Bi powder as the starting material and CdTe sputtered films doped by implantation with different Bi-doses. Temperature-dependent resistivity and Hall effect measurements and a discussion on the efficiency of both doping processes are presented.

  19. On the doping problem of CdTe films: The bismuth case

    International Nuclear Information System (INIS)

    The controlled increase of hole concentration is an important issue and still an unsolved problem for polycrystalline CdTe-based solar cells. The typical hole concentration of as-grown CdTe thin-films goes up to 1013 cm-3, depending on the specific growth technique. The highest electron concentration obtained for CdS, the suitable window partner material of CdTe, is around 1015 cm-3. Thus, the PV-performance of a CdS/CdTe device can be optimized if the hole concentration in CdTe is increased. We have faced up this problem by studying the electrical properties of two types of CdTe films: CdTe films grown by Close Space Vapor Transport using a CdTe:Bi powder as the starting material and CdTe sputtered films doped by implantation with different Bi-doses. Temperature-dependent resistivity and Hall effect measurements and a discussion on the efficiency of both doping processes are presented

  20. Biomimetic thin film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Rieke, P.R.; Graff, G.E.; Campbell, A.A.; Bunker, B.C.; Baskaran, S.; Song, L.; Tarasevich, B.J.; Fryxell, G.E.

    1995-09-01

    Biological mineral deposition for the formation of bone, mollusk shell and other hard tissues provides materials scientists with illustrative materials processing strategies. This presentation will review the key features of biomineralization and how these features can be of technical importance. We have adapted existing knowledge of biomineralization to develop a unique method of depositing inorganic thin films and coating. Our approach to thin film deposition is to modify substrate surfaces to imitate the proteins found in nature that are responsible for controlling mineral deposition. These biomimetic surfaces control the nucleation and growth of the mineral from a supersaturated aqueous solution. This has many processing advantages including simple processing equipment, environmentally benign reagents, uniform coating of highly complex shapes, and enhanced adherence of coating. Many different types of metal oxide, hydroxide, sulfide and phosphate materials with useful mechanical, optical, electronic and biomedical properties can be deposited.

  1. Preparation and multicolored fluorescent properties of CdTe quantum dots/polymethylmethacrylate composite films

    Energy Technology Data Exchange (ETDEWEB)

    Huang, Yanni; Liu, Jianjun, E-mail: jjliu717@aliyun.com; Yu, Yingchun; Zuo, Shengli

    2015-10-25

    A new simple route was presented for the preparation of stable fluorescent CdTe/polymethylmethacrylate (CdTe/PMMA) composite films by using hydrophilic thioglycolic acid capped CdTe quantum dots (TGA-CdTe QDs) and polymethylmethacrylate (PMMA) as raw materials. The TGA-CdTe QDs were firstly exchanged with n-dodecanethiol (DDT) to become hydrophobic DDT-CdTe QDs via a ligand exchange strategy, and then incorporated into PMMA matrix to obtain fluorescent CdTe/PMMA composite films. The structure and optical properties of DDT-CdTe QDs and CdTe/PMMA composite films were investigated by XRD, IR, UV and PL techniques. The results indicated that the obtained DDT-CdTe QDs well preserved the intrinsic structure and the maximum emission wavelength of the initial water-soluble QDs and the resulting 6.10 wt% CdTe/PMMA composite film exhibited significantly enhanced PL intensity. Furthermore, the multicolored composite films with green, yellow-green, yellow and orange light emissions were well tuned by incorporating the CdTe QDs of various maximum emission wavelengths. The TEM image demonstrated that the CdTe QDs were well-dispersed in the PMMA matrix without aggregation. Superior photostability of QDs in the composite film was confirmed by fluorescence lifetime measurement. Thermo-gravimetric analysis of CdTe/PMMA composite films showed no obvious enhancement of thermal stability compared with pure PMMA. - Highlights: • Ligand-exchange strategy was used to render CdTe QDs oil-soluble. • CdTe QDs were incorporated into PMMA matrix to fabricate fluorescent films. • The resulting 6.10 wt% CdTe/PMMA film exhibited significantly enhanced PL intensity. • Fluorescent colors of films were tuned by varying the λ{sub em} of incorporated CdTe QDs.

  2. Preparation and multicolored fluorescent properties of CdTe quantum dots/polymethylmethacrylate composite films

    International Nuclear Information System (INIS)

    A new simple route was presented for the preparation of stable fluorescent CdTe/polymethylmethacrylate (CdTe/PMMA) composite films by using hydrophilic thioglycolic acid capped CdTe quantum dots (TGA-CdTe QDs) and polymethylmethacrylate (PMMA) as raw materials. The TGA-CdTe QDs were firstly exchanged with n-dodecanethiol (DDT) to become hydrophobic DDT-CdTe QDs via a ligand exchange strategy, and then incorporated into PMMA matrix to obtain fluorescent CdTe/PMMA composite films. The structure and optical properties of DDT-CdTe QDs and CdTe/PMMA composite films were investigated by XRD, IR, UV and PL techniques. The results indicated that the obtained DDT-CdTe QDs well preserved the intrinsic structure and the maximum emission wavelength of the initial water-soluble QDs and the resulting 6.10 wt% CdTe/PMMA composite film exhibited significantly enhanced PL intensity. Furthermore, the multicolored composite films with green, yellow-green, yellow and orange light emissions were well tuned by incorporating the CdTe QDs of various maximum emission wavelengths. The TEM image demonstrated that the CdTe QDs were well-dispersed in the PMMA matrix without aggregation. Superior photostability of QDs in the composite film was confirmed by fluorescence lifetime measurement. Thermo-gravimetric analysis of CdTe/PMMA composite films showed no obvious enhancement of thermal stability compared with pure PMMA. - Highlights: • Ligand-exchange strategy was used to render CdTe QDs oil-soluble. • CdTe QDs were incorporated into PMMA matrix to fabricate fluorescent films. • The resulting 6.10 wt% CdTe/PMMA film exhibited significantly enhanced PL intensity. • Fluorescent colors of films were tuned by varying the λem of incorporated CdTe QDs

  3. Progress towards high efficiency thin film CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Mitchell, K.W.; Eberspacher, C.; Cohen, F.; Avery, J.; Duran, G.; Bottenberg, W.

    1988-01-15

    This paper describes work investigating high rate cadmium telluride (CdTe) film deposition by close-space vapor transport, leading to 4 cm/sup 2/ tin oxide/CdTe solar cells of efficiency greater than 10%. Under a 100 mW cm/sup -2/ air mass 1.5 global spectrum, a cell of efficiency 10.5% had a short-circuit current of 28.1 mA cm/sup -2/, an open circuit voltage of 0.663 V and a fill factor of 0.563. Our major achievements include (1) the use of completely nonvacuum processing, (2) the fabrication of simple transparent conductive oxide/CdTe cells without need of a CdS window layer, and (3) screenprinted back contacts.

  4. First principles study of Bi dopen CdTe thin film solar cells: electronic and optical properties

    OpenAIRE

    Seminóvski Pérez, Yohanna; Palacios Clemente, Pablo; Wahnón Benarroch, Perla

    2011-01-01

    Nowadays, efficiency improvement of solar cells is one of the most important issues in photovoltaic systems and CdTe is one of the most promising thin film photovoltaic materials we can found. CdTe reported efficiencies in solar energy conversion have been as good as that found in polycrystalline Si thin film cell [1], besides CdTe can be easily produced at industrial scale.

  5. Wide bandgap thin film solar cells from CdTe alloys

    International Nuclear Information System (INIS)

    Ternary films of CdZnTe and CdMnTe were grown by molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), respectively, on glass/SnO2/CdS substrates with target bandgap of 1.7 to 1.8 eV for solar cell applications. The authors describe x-ray diffraction, surface photovoltage spectroscopy, and Auger electron spectroscopy measurements performed to estimate bandgap, compositional uniformity, and interface quality of the films. Front-wall CdTe cell (glass/SnO2/CdS/CdTe/ZnTe/Metal) efficiencies were --9%, while CdZnTe and CdMnTe efficiencies were --3.6% and 6%, respectively. n-i-p cell efficiencies were consistently higher than n-p cells. Optimum cell processing temperature for CdZnTe films was found to be less than 4000C. Higher processing temperatures caused a shift in bandgap coupled with film quality degradation

  6. Red shift for CdTe nanoparticle thin films and suspensions during heating.

    Science.gov (United States)

    Dunn, S; Gardner, H C; Bertoni, C; Gallardo, D E; Gaponik, N; Eychmüller, A

    2008-05-01

    The work that we have conducted shows that temperature affects the wavelength of light emitted from CdTe nanoparticle clusters that are in a suspension or deposited into thin films via a layer-by-layer process. Compared with the stock suspension, the films show an initial photoluminescent shift, of circa 6-8 nm to the red, when the particles are deposited. A shift of circa 6-8 nm is also seen when the suspensions are first heated to 85 degrees C from room temperature (20 degrees C) having been stored in a fridge at 5 degrees C. This shift is non-recoverable. With continual cycling from room temperature to 85 degrees C the suspensions show a slight tendency for the emission to move increasingly to the red; whereas the films show no such tendency. In both cases, the range in emission is ca 10 nm from the room temperature state to 80 degrees C. The intensity of the emission from the film drops abruptly (ca 50% reduction) after one cycle of heating; in the suspension there is an initial increase (ca 3-5% increase) in intensity before it decays. We see that the shift towards the red has been attributed to energy transfer or a rearrangement of the packing of the particles in the thin films. After conducting analysis of the films using scanning probe microscopy we have determined that a change in the morphology is responsible for the permanent shift in emission wavelength associated with prolonged heating. The influence of traps has not been ruled out, but the morphological change in the samples is very large and is likely to be the dominating mechanism affecting change for the red shift at room temperature. PMID:18572681

  7. Formation and Properties of Polycrystalline p-Type High-Conductivity CdTe Films by Coevaporation of CdTe and Te

    Science.gov (United States)

    Hayashi, Toshiya; Hayashi, Hiroaki; Fukaya, Mitsuru; Ema, Yoshinori

    1991-10-01

    Polycrystalline p-type high-dark-conductivity CdTe films have been prepared by coevaporation of CdTe and Te. The structural and electrical properties were investigated. The dark conductivity of the films at 300 K ranged from 6.32× 10-8 to 3.41 S cm-1. The film structure was of the zincblende type with a preferential orientation of the (111) planes parallel to the substrate. The crystallinity was rather good. From the measurements of the carrier concentration versus ambient temperature characteristics, it was found that the high-conductivity p-type conduction of the films was due to the formation of Cd vacancies, acceptors resulting from the coevaporation of CdTe and Te. It is shown that the high-conductivity films obtained are suitable for p-CdTe/n-CdS solar cells.

  8. A Comparative Study on the Optical Properties of Multilayer CdSe / CdTe Thin Film with Single Layer CdTe and CdSe Films

    Directory of Open Access Journals (Sweden)

    M. Melvin David Kumar

    2013-07-01

    Full Text Available CdTe and CdSe single layer thin films and CdSe / CdTe multilayer (ML thin film were prepared by using physical vapour deposition method. Optical properties of CdSe / CdTe multilayer thin film shows different behavior due to type II band structure alignment. Energy band gap value of CdSe / CdTe ML thin film is shifted to higher value than that of single layer CdTe film. This is due to decrease in crystallite size to dimension smaller than the Bohr exciton radius of CdTe (14 nm. Crystallite size of the multilayer sample was calculated with the predictions of the effective mass approximation model (i.e., Brus model. It is observed that the photoluminescence peak of CdSe / CdTe ML thin film is red shifted compared to the peaks corresponding to individual CdSe and CdTe thin films. This may be due to the presence of type II quantum dot formation in the CdSe / CdTe heterostructure multilayer thin film.

  9. Rf sputtering of CdTE and CdS for thin film PV

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.D.; Tabory, C.N.; Shao, M.; Fischer, A.; Feng, Z.; Bohn, R.G. (Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States))

    1994-06-30

    In late 1992 we demonstrated the first rf sputtered CdS/CdTe photovoltaic cell with efficiency exceeding 10%. In this cell both CdS and CdTe layers were deposited by rf sputtering. In this paper we report preliminary measurements of (1) optical emission spectroscopy of the rf plasma, (2) the width of the phonon Raman line as a function of deposition temperature for CdS, and (3) studies of oxygen doping during pulsed laser deposition of CdTe.

  10. Structural, optical, photoluminescence, dielectric and electrical studies of vacuum-evaporated CdTe thin films

    Indian Academy of Sciences (India)

    Ziaul Raza Khan; M Zulfequar; Mohd Shahid Khan

    2012-04-01

    Highly-oriented CdTe thin films were fabricated on quartz and glass substrates by thermal evaporation technique in the vacuum of about 2 × 10-5 torr. The CdTe thin films were characterized by X-ray diffraction (XRD), UV–VIS–NIR, photoluminescence spectroscopy and scanning electron microscopy (SEM). X-ray diffraction results showed that the films were polycrystalline with cubic structure and had preferred growth of grains along the (111) crystallographic direction. Scanning electron micrographs showed that the growth of crystallites of comparable size on both the substrates. At the room temperature, photoluminescence spectra of the films on both the substrates showed sharp peaks with a maximum at 805 nm. This band showed significant narrowing suggesting that it originates from the transitions involving grain boundary defects. The refractive index of CdTe thin films was calculated using interference pattern of transmission spectra. The optical band gap of thin films was found to allow direct transition with energy gap of 1.47–1.50 eV. a.c. conductivity of CdTe thin films was found to increase with the increase in frequency whereas dielectric constant was observed to decrease with the increase in frequency.

  11. Effects of CdCl sub 2 on the growth of CdTe on CdS films for solar cells by isothermal close-spaced vapour transport

    Energy Technology Data Exchange (ETDEWEB)

    Vaccaro, P.O.; Meyer, G.; Saura, J. (Comision Nacional de Energia Atomica, San Carlos de Bariloche (Argentina). Centro Atomico Bariloche)

    1991-10-14

    CdS/CdTe solar cells were made by depositing CdTe films by an isothermal close-spaced vapour transport method on sintered CdS/glass substrates. The influence of amounts of CdCl{sub 2} ranging from O wt.% to 8 wt% in the CdTe source on the solar cell performance was studied. Increasing the CdCl{sub 2} content enhances the CdTe grain size but degrades the spectral response and increases the reverse saturation current. An optimal CdCl{sub 2} concentration of 1wt% was found for a growth temperature of 620{sup o}C. (author).

  12. Synthesis and optical characterization of nanocrystalline CdTe thin films

    Science.gov (United States)

    Al-Ghamdi, A. A.; Khan, Shamshad A.; Nagat, A.; Abd El-Sadek, M. S.

    2010-11-01

    From several years the study of binary compounds has been intensified in order to find new materials for solar photocells. The development of thin film solar cells is an active area of research at this time. Much attention has been paid to the development of low cost, high efficiency thin film solar cells. CdTe is one of the suitable candidates for the production of thin film solar cells due to its ideal band gap, high absorption coefficient. The present work deals with thickness dependent study of CdTe thin films. Nanocrystalline CdTe bulk powder was synthesized by wet chemical route at pH≈11.2 using cadmium chloride and potassium telluride as starting materials. The product sample was characterized by transmission electron microscope, X-ray diffraction and scanning electron microscope. The structural characteristics studied by X-ray diffraction showed that the films are polycrystalline in nature. CdTe thin films with thickness 40, 60, 80 and 100 nm were prepared on glass substrates by using thermal evaporation onto glass substrate under a vacuum of 10 -6 Torr. The optical constants (absorption coefficient, optical band gap, refractive index, extinction coefficient, real and imaginary part of dielectric constant) of CdTe thin films was studied as a function of photon energy in the wavelength region 400-2000 nm. Analysis of the optical absorption data shows that the rule of direct transitions predominates. It has been found that the absorption coefficient, refractive index ( n) and extinction coefficient ( k) decreases while the values of optical band gap increase with an increase in thickness from 40 to 100 nm, which can be explained qualitatively by a thickness dependence of the grain size through decrease in grain boundary barrier height with grain size.

  13. Deposition and properties of CdTe nanowires prepared by template replication

    Energy Technology Data Exchange (ETDEWEB)

    Enculescu, Ionut; Sima, Marian; Enculescu, Monica; Enache, Mihaela [National Institute for Materials Physics, Bucharest-Magurele (Romania); Ion, Lucian; Antohe, Stefan [Faculty of Physics, University of Bucharest (Romania); Neumann, Reinhard [Gesellschaft fuer Schwerionenforschung, Darmstadt (Germany)

    2007-05-15

    We used the template method to prepare CdTe wires with diameters ranging from 80 nm to 1 {mu}m. As templates we used polycarbonate and polyethilene terephtalate ion track membranes and as the method of filling the pores of such membranes we employed electrochemical deposition. The conditions (i.e. bath composition and deposition potential) necessary to obtain the stoichiometric composition of the semiconductor were found. Scanning and transmission electron microscopy were employed for morphological characterization of the nano and microwires. Energy dispersive X-ray analysis was employed for determining the Cd/Te ratio. Selected area electron diffraction was employed for structural measurements. Reflection spectroscopy measurements were performed on nanowire arrays for determining the band gap of the deposited nanostructures. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  14. Characteristics of CdTe films and CdTe/CdS solar cells fabricated by photostimulated sublimation

    International Nuclear Information System (INIS)

    Full text : The effect of illumination during the close-spaced sublimation (CSS) growth on composition, structural, electrical, optical and photovoltaic properties of CdTe films and CdTe/CdS solar cells was investigated. Data on comparative study by using X-ray diffraction (XRD), X-ray fluorescence (XRF), scanning electron microscopy (SEM), absorption spectra and conductivity-temperature measurements of CdTe films prepared by CSS method in a dark (CSSD) and under illumination (CSSI) were presented. It is shown that the growth rate of CdTe films under illumination is higher than that for films prepared without illumination. Moreover, the polycrystalline CdTe films of the cubic structure grown by CSSI technology were characterized with larger the grain size as compared to that for films prepared by CSSD

  15. High efficiency thin film CdTe and a-Si based solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A. D.; Deng, X.; Bohn, R. G.

    2000-01-04

    This report describes work done by the University of Toledo during the first year of this subcontract. During this time, the CdTe group constructed a second dual magnetron sputter deposition facility; optimized reactive sputtering for ZnTe:N films to achieve 10 ohm-cm resistivity and {approximately}9% efficiency cells with a copper-free ZnTe:N/Ni contact; identified Cu-related photoluminescence features and studied their correlation with cell performance including their dependence on temperature and E-fields; studied band-tail absorption in CdS{sub x}Te{sub 1{minus}x} films at 10 K and 300 K; collaborated with the National CdTe PV Team on (1) studies of high-resistivity tin oxide (HRT) layers from ITN Energy Systems, (2) fabrication of cells on the HRT layers with 0, 300, and 800-nm CdS, and (3) preparation of ZnTe:N-based contacts on First Solar materials for stress testing; and collaborated with Brooklyn College for ellipsometry studies of CdS{sub x}Te{sub 1{minus}x} alloy films, and with the University of Buffalo/Brookhaven NSLS for synchrotron X-ray fluorescence studies of interdiffusion in CdS/CdTe bilayers. The a-Si group established a baseline for fabricating a-Si-based solar cells with single, tandem, and triple-junction structures; fabricated a-Si/a-SiGe/a-SiGe triple-junction solar cells with an initial efficiency of 9.7% during the second quarter, and 10.6% during the fourth quarter (after 1166 hours of light-soaking under 1-sun light intensity at 50 C, the 10.6% solar cells stabilized at about 9%); fabricated wide-bandgap a-Si top cells, the highest Voc achieved for the single-junction top cell was 1.02 V, and top cells with high FF (up to 74%) were fabricated routinely; fabricated high-quality narrow-bandgap a-SiGe solar cells with 8.3% efficiency; found that bandgap-graded buffer layers improve the performance (Voc and FF) of the narrow-bandgap a-SiGe bottom cells; and found that a small amount of oxygen partial pressure ({approximately}2 {times} 10

  16. Thin Film CIGS and CdTe Photovoltaic Technologies: Commercialization, Critical Issues, and Applications; Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Ullal, H. S.; von Roedern, B.

    2007-09-01

    We report here on the major commercialization aspects of thin-film photovoltaic (PV) technologies based on CIGS and CdTe (a-Si and thin-Si are also reported for completeness on the status of thin-film PV). Worldwide silicon (Si) based PV technologies continues to dominate at more than 94% of the market share, with the share of thin-film PV at less than 6%. However, the market share for thin-film PV in the United States continues to grow rapidly over the past several years and in CY 2006, they had a substantial contribution of about 44%, compared to less than 10% in CY 2003. In CY 2007, thin-film PV market share is expected to surpass that of Si technology in the United States. Worldwide estimated projections for CY 2010 are that thin-film PV production capacity will be more than 3700 MW. A 40-MW thin-film CdTe solar field is currently being installed in Saxony, Germany, and will be completed in early CY 2009. The total project cost is Euro 130 million, which equates to an installed PV system price of Euro 3.25/-watt averaged over the entire solar project. This is the lowest price for any installed PV system in the world today. Critical research, development, and technology issues for thin-film CIGS and CdTe are also elucidated in this paper.

  17. Native Defect Control of CdTe Thin Film Solar Cells by Close-Spaced Sublimation

    Science.gov (United States)

    Okamoto, Tamotsu; Kitamoto, Shinji; Yamada, Akira; Konagai, Makoto

    2001-05-01

    The control of native defects in the CdTe thin film solar cells was investigated using a novel source for close-spaced sublimation (CSS) process which was prepared by vacuum evaporation with elemental Cd and Te (evaporated source). The evaporated sources were prepared on glass substrates at room temperature, and the Cd/Te ratio was controlled by varying the Cd and Te beam equivalent pressures. In the cells using the Te-rich source, the conversion efficiency was less than 0.2% because of the extremely low shunt resistance. On the other hand, a conversion efficiency above 15% was obtained by using the Cd-rich source. Capacitance-voltage (C-V) characteristics revealed that the acceptor concentration in the CdTe layer increased with increasing Cd/Te ratio of the evaporated source. Furthermore, photoluminescence spectra implied that the formation of the Cd vacancies in the CdTe layer was suppressed using the Cd-rich source.

  18. Temperature and illumination intensity dependence of photoconductivity in sputter-deposited heteroepitaxial (100)CdTe layers

    Science.gov (United States)

    Das, S. R.; Cook, J. G.; Mukherjee, G.

    1991-06-01

    The photoconductivity behavior and the Hall-effect of sputter-deposited heteroepitaxial (100)CdTe layers grown at temperatures between 300 and 325 C were investigated. The (100)CdTe epilayers were found to be highly photoconductive and exhibited photoconductivity/dark conductivity ratios as high as 1 x 10 to the 6th at around 200 K. Photoconductivity showed a sublinear dependence on the illumination intensity and was higher at higher temperatures. It is shown that the model of Simmons and Taylor (1974) developed to explain photoconductivity in amorphous semiconductors is also applicable to the (100)CdTe epitaxial layers.

  19. Grown of CdTe:Eu films by pulsed laser deposition

    OpenAIRE

    M. Zapata-Torres; M. González-Alcudia; Meléndez-Lira, M.; O. Calzadilla Amaya

    2006-01-01

    CdTe:Eu films were grown by the pulsed laser deposition method on glass substrates. The targets were prepared with three different concentrations of Cd, Te and Eu employing CdTe and EuTe powders, homogenized by ball milling. X-ray diffraction measurements showed that the samples grown with a mixture of phases related with the structure of CdTe and EuTe, with a little increase of the lattice parameter. Scanning Electron micrographs revealed that CdTe:Eu films presented a texture similar to sol...

  20. Optical and structural characterization of oleic acid-stabilized CdTe nanocrystals for solution thin film processing

    Directory of Open Access Journals (Sweden)

    Claudio Davet Gutiérrez-Lazos

    2014-06-01

    Full Text Available This work presents results of the optical and structural characterization of oleic acid-stabilized cadmium telluride nanocrystals (CdTe-NC synthesized by an organometallic route. After being cleaned, the CdTe-NC were dispersed in toluene to obtain an ink-like dispersion, which was drop-cast on glass substrate to deposit a thin film. The CdTe-NC colloidal dispersion as well as the CdTe drop-cast thin films were characterized with regard to the optical and structural properties. TEM analysis indicates that the CdTe-NC have a nearly spherical shape (3.5 nm as mean size. Electron diffraction and XRD diffraction analyses indicated the bulk-CdTe face-centered cubic structure for CdTe-NC. An additional diffraction line corresponding to the octahedral Cd3P2 was also detected as a secondary phase, which probably originates by reacting free cadmium ions with trioctylphosphine (the tellurium reducing agent. The Raman spectrum exhibits two broad bands centered at 141.6 and 162.3 cm−1, which could be associated to the TO and LO modes of cubic CdTe nanocrystals, respectively. Additional peaks located in the 222 to 324 cm−1 range, agree fairly well with the wavenumbers reported for TO modes of octahedral Cd3P2.

  1. Cd-Te-In oxide thin films as possible transparent buffer layer in CdTe based solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Castro-Rodriguez, R; Camacho, J M; Pena, J L [Applied Physics Department, CINVESTAV-IPN Merida, C.P. 97310, Merida, Yucatan (Mexico); Martel, A; Mendez-Gamboa, J, E-mail: romano@mda.cinvestav.m [Facultad de Ingenieria, Universidad Autonoma de Yucatan. AP 150 Cordemex, 97310 Merida, Yucatan (Mexico)

    2009-05-01

    Cd-Te-In-oxide thin films were grown by Pulsed Laser Deposition (PLD) technique using CdTe powder embedded in a matrix of indium metallic as target. The films were deposited at different oxygen pressures (P{sub o2}) from 15 to 50 mTorr at substrate temperature of 420{sup 0}C. Sheet resistance (R{sub sheet}) and transmission spectrum were measured as a function of P{sub o2}. From measurements of optical transmission, the Photonic Flux Density (PFD) spectrum were obtained and the integral of these PFD for each film were evaluated between energy range of 1.5 eV and 2.4 eV for obtain the amount of photons that can be transferred across the film in this range of solar energy spectrum. These values were evaluated over the R{sub sheet} to be used as a figure of merit. The best choice in our conditions was the films with P{sub o2} =28.5 mTorr, where the figure of merit reaches the maximum value.

  2. A model for the growth of cdte by metal organic chemical vapor deposition

    Science.gov (United States)

    Nemirovsky, Y.; Goren, D.; Ruzin, A.

    1991-10-01

    A kinetic model for the metalorganic chemical vapor deposition (MOCVD) growth of CdTe over a wide temperature range is presented. The model yields the growth rate as a function of the gas-phase concentrations of the constituents. The model is corroborated with experimental results obtained by the MOCVD growth of CdTe at 380° C. The major features of the model are the observed two-step surface-controlled pyrolysis and surface saturation, leading initially to a growth rate that increases with the square root of the concentrations of the reacting species and subsequently to a decrease of the growth rate as the concentrations increase. At even higher concentrations, an additional increase of growth rate is observed and modeled.

  3. High Efficiency Thin Film CdTe and a-Si Based Solar Cells: Annual Technical Report, 4 March 1999 - 3 March 2000

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A. D.; Deng, X.; Bohn, R. G. (The University of Toledo)

    2001-08-29

    This report describes the research on high-efficiency CdTe-based thin-film solar cells and on high-efficiency a-Si-based thin-film solar cells. Implemented a diode-array spectrograph system and used optical emission spectroscopy to help optimize the reactive sputtering of N-doped ZnTe for CdTe back-contact structures. Identified the photoluminescence signatures of various defect states in CdTe related to Cd vacancies, CuCd acceptors, Cu-VCd complexes, and donor-acceptor pairs, and related these states to instabilities in the hole concentration at room temperature. Showed that Cu is an important non-radiative center in CdS, reducing the PL efficiency. Studied band tailing in CdS weakly alloyed with CdTe and CdTe weakly alloyed with CdS. Fabricated superstrate ITO/CdS/CdTe cells on Mo substrates with efficiencies above 7.5%. Collaborated in studies of EXAFS of Cu in CdTe which indicate a Cu-Te bond length of 2.62 {angstrom} or 6.7% shorter than the CdTe, bond in agreement with calculations of Wei et al. Provided assistance to two groups on laser scribing. Comparatively studied the performance of a-SiGe solar cells and properties of a-SiGe single-layer films deposited using a wide range of H dilution, observed transition from a-SiGe to {mu}c-SiGe at high H dilution and the impact on cell performances. Comparatively studied the performance of a-SiGe solar cells and properties of a-SiGe single-layer films with different Ge contents, suitable for use as component cells of triple-junction devices. Fabricated a-Si-based solar cells on ultra-thin stainless-steel substrate (7.5 micron) and obtained equivalent performance and yield as on the regular SS substrates (127 microns). Comparatively studied the performance of a-Si-based solar cells on SS substrates and on SnO2-coated glass substrates. Studied the performance of p-layers deposited under various deposition conditions for n-i-p type solar cells. Performed an analysis for the component cell current-matching within a

  4. High Efficiency Thin Film CdTe and a-Si Based Solar Cells: Annual Technical Report, 4 March 1999 - 3 March 2000; ANNUAL

    International Nuclear Information System (INIS)

    This report describes the research on high-efficiency CdTe-based thin-film solar cells and on high-efficiency a-Si-based thin-film solar cells. Implemented a diode-array spectrograph system and used optical emission spectroscopy to help optimize the reactive sputtering of N-doped ZnTe for CdTe back-contact structures. Identified the photoluminescence signatures of various defect states in CdTe related to Cd vacancies, CuCd acceptors, Cu-VCd complexes, and donor-acceptor pairs, and related these states to instabilities in the hole concentration at room temperature. Showed that Cu is an important non-radiative center in CdS, reducing the PL efficiency. Studied band tailing in CdS weakly alloyed with CdTe and CdTe weakly alloyed with CdS. Fabricated superstrate ITO/CdS/CdTe cells on Mo substrates with efficiencies above 7.5%. Collaborated in studies of EXAFS of Cu in CdTe which indicate a Cu-Te bond length of 2.62(angstrom) or 6.7% shorter than the CdTe, bond in agreement with calculations of Wei et al. Provided assistance to two groups on laser scribing. Comparatively studied the performance of a-SiGe solar cells and properties of a-SiGe single-layer films deposited using a wide range of H dilution, observed transition from a-SiGe to(mu)c-SiGe at high H dilution and the impact on cell performances. Comparatively studied the performance of a-SiGe solar cells and properties of a-SiGe single-layer films with different Ge contents, suitable for use as component cells of triple-junction devices. Fabricated a-Si-based solar cells on ultra-thin stainless-steel substrate (7.5 micron) and obtained equivalent performance and yield as on the regular SS substrates (127 microns). Comparatively studied the performance of a-Si-based solar cells on SS substrates and on SnO2-coated glass substrates. Studied the performance of p-layers deposited under various deposition conditions for n-i-p type solar cells. Performed an analysis for the component cell current-matching within a triple

  5. Chemical and microstructural study in radio frequency sputtered CdTe oxide films prepared at different N{sub 2}O pressures. Oxygen incorporation and film resputtering

    Energy Technology Data Exchange (ETDEWEB)

    Caballero-Briones, F. [CICATA-IPN Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600, Altamira, Tamps (Mexico)], E-mail: fcaballerobriones@ub.edu; Oliva, A.I.; Bartolo-Perez, P. [Applied Physics Department, CINVESTAV-IPN Unidad Merida, A.P. 73 Cordemex, 97310 Merida, Yucatan (Mexico); Zapata-Navarro, A. [CICATA-IPN Unidad Legaria, Legaria 694 Col. Irrigacion 11500, Mexico, D.F. (Mexico); Pena, J.L. [Applied Physics Department, CINVESTAV-IPN Unidad Merida, A.P. 73 Cordemex, 97310 Merida, Yucatan (Mexico)

    2008-10-01

    CdTe oxide films were grown by radio frequency sputtering in Ar-N{sub 2}O plasma at different N{sub 2}O partial pressures. The film oxygen content determined by Auger electron spectroscopy ranged from 15 to 60 at.%. The free O{sub 2} production during film deposition was monitored by in situ mass spectroscopy and it was found that it increases linearly over a critical N{sub 2}O pressure {approx} 4.7 x 10{sup -3} Pa alike the oxygen in the films. Film microstructure was studied by Raman spectroscopy and atomic force microscopy. Evidence of bands related to terminal Te-O vibrations was found in films prepared below the N{sub 2}O critical pressure, becoming predominant in films with higher oxygen content. The morphology and roughness evolution of the films confirm that they consist of a mixture of phases. Surface structures of the Ia-type and of the Ib-type were observed below and above the critical N{sub 2}O pressure. Eventually, ion bombardment process caused film resputtering.

  6. Chemical and microstructural study in radio frequency sputtered CdTe oxide films prepared at different N2O pressures. Oxygen incorporation and film resputtering

    International Nuclear Information System (INIS)

    CdTe oxide films were grown by radio frequency sputtering in Ar-N2O plasma at different N2O partial pressures. The film oxygen content determined by Auger electron spectroscopy ranged from 15 to 60 at.%. The free O2 production during film deposition was monitored by in situ mass spectroscopy and it was found that it increases linearly over a critical N2O pressure ∼ 4.7 x 10-3 Pa alike the oxygen in the films. Film microstructure was studied by Raman spectroscopy and atomic force microscopy. Evidence of bands related to terminal Te-O vibrations was found in films prepared below the N2O critical pressure, becoming predominant in films with higher oxygen content. The morphology and roughness evolution of the films confirm that they consist of a mixture of phases. Surface structures of the Ia-type and of the Ib-type were observed below and above the critical N2O pressure. Eventually, ion bombardment process caused film resputtering

  7. Cathodoluminescence spectrum imaging analysis of CdTe thin-film bevels

    Energy Technology Data Exchange (ETDEWEB)

    Moseley, John [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Colorado School of Mines, 1500 Illinois Street, Golden, Colorado 80401, USA; Al-Jassim, Mowafak M. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Guthrey, Harvey L. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Burst, James M. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Duenow, Joel N. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Ahrenkiel, Richard K. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA; Colorado School of Mines, 1500 Illinois Street, Golden, Colorado 80401, USA; Metzger, Wyatt K. [National Renewable Energy Laboratory, 15013 Denver West Parkway, Golden, Colorado 80401, USA

    2016-09-09

    We conducted T = 6 K cathodoluminescence (CL) spectrum imaging with a nanoscale electron beam on beveled surfaces of CdTe thin films at the critical stages of standard CdTe solar cell fabrication. We find that the through-thickness CL total intensity profiles are consistent with a reduction in grain-boundary recombination due to the CdCl2 treatment. The color-coded CL maps of the near-band-edge transitions indicate significant variations in the defect recombination activity at the micron and sub-micron scales within grains, from grain to grain, throughout the film depth, and between films with different processing histories. We estimated the grain-interior sulfur-alloying fraction in the interdiffused CdTe/CdS region of the CdCl2-treated films from a sample of 35 grains and found that it is not strongly correlated with CL intensity. A kinetic rate-equation model was used to simulate grain-boundary (GB) and grain-interior CL spectra. Simulations indicate that the large reduction in the exciton band intensity and relatively small decrease in the lower-energy band intensity at CdTe GBs or dislocations can be explained by an enhanced electron-hole non-radiative recombination rate at the deep GB or dislocation defects. Simulations also show that higher GB concentrations of donors and/or acceptors can increase the lower-energy band intensity, while slightly decreasing the exciton band intensity.

  8. Cathodoluminescence spectrum imaging analysis of CdTe thin-film bevels

    Science.gov (United States)

    Moseley, John; Al-Jassim, Mowafak M.; Guthrey, Harvey L.; Burst, James M.; Duenow, Joel N.; Ahrenkiel, Richard K.; Metzger, Wyatt K.

    2016-09-01

    We conducted T = 6 K cathodoluminescence (CL) spectrum imaging with a nanoscale electron beam on beveled surfaces of CdTe thin films at the critical stages of standard CdTe solar cell fabrication. We find that the through-thickness CL total intensity profiles are consistent with a reduction in grain-boundary recombination due to the CdCl2 treatment. The color-coded CL maps of the near-band-edge transitions indicate significant variations in the defect recombination activity at the micron and sub-micron scales within grains, from grain to grain, throughout the film depth, and between films with different processing histories. We estimated the grain-interior sulfur-alloying fraction in the interdiffused CdTe/CdS region of the CdCl2-treated films from a sample of 35 grains and found that it is not strongly correlated with CL intensity. A kinetic rate-equation model was used to simulate grain-boundary (GB) and grain-interior CL spectra. Simulations indicate that the large reduction in the exciton band intensity and relatively small decrease in the lower-energy band intensity at CdTe GBs or dislocations can be explained by an enhanced electron-hole non-radiative recombination rate at the deep GB or dislocation defects. Simulations also show that higher GB concentrations of donors and/or acceptors can increase the lower-energy band intensity, while slightly decreasing the exciton band intensity.

  9. Influence of Kilo-Electron Oxygen Ion Irradiation on Structural, Electrical and Optical Properties of CdTe Thin Films

    Science.gov (United States)

    Honey, Shehla; Thema, F. T.; Bhatti, M. T.; Ishaq, A.; Naseem, Shahzad; Maaza, M.

    2016-09-01

    In this paper, effect of oxygen (O+) ion irradiation on the properties of polycrystalline cubic structure CdTe thin films has been investigated. CdTe thin films were irradiated with O+ ions of energy 80keV at different fluence ranging from 1×1015 to 5×1016 ion/cm2 at room temperature. At 1×1015 ion/cm2 O+ ions fluence, the CdTe structure was maintained while XRD peaks of cubic phase were shifted toward lower angles. At 5×1016 ion/cm2 O+ ions fluence, cubic structure of CdTe thin films was transformed into hexagonal structure. In addition, electrical resistivity and optical bandgap were decreased with increasing O+ ion beam irradiation.

  10. Admittance spectroscopy characterize graphite paste for back contact of CdTe thin film solar cells

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    CdTe thin film solar cells with a doped-graphite paste back contact layer were studied using admittance spectroscopy technology.The positions and the capture cross sections of energy level in the forbidden band were calculated,which are the important parameters to affect solar cell performance.The results showed that there were three defects in the CdTe thin films solar cells with the doped-graphite paste back contact layer,whose positions in the forbidden band were close to 0.34,0.46 and 0.51 eV,respectively above the valence band,and capture cross sections were 2.23×10-16,2.41×10-14,4.38×10-13 cm2,respectively.

  11. Identification of critical stacking faults in thin-film CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Yoo, Su-Hyun; Walsh, Aron, E-mail: a.walsh@bath.ac.uk [Global E3 Institute, Department of Materials Science and Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of); Centre for Sustainable Chemical Technologies and Department of Chemistry, University of Bath, Bath BA2 7AY (United Kingdom); Butler, Keith T. [Centre for Sustainable Chemical Technologies and Department of Chemistry, University of Bath, Bath BA2 7AY (United Kingdom); Soon, Aloysius [Global E3 Institute, Department of Materials Science and Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of); Abbas, Ali; Walls, John M., E-mail: j.m.wall@loughborough.ac.uk [Centre for Renewable Energy Systems Technology, School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)

    2014-08-11

    Cadmium telluride (CdTe) is a p-type semiconductor used in thin-film solar cells. To achieve high light-to-electricity conversion, annealing in the presence of CdCl{sub 2} is essential, but the underlying mechanism is still under debate. Recent evidence suggests that a reduction in the high density of stacking faults in the CdTe grains is a key process that occurs during the chemical treatment. A range of stacking faults, including intrinsic, extrinsic, and twin boundary, are computationally investigated to identify the extended defects that limit performance. The low-energy faults are found to be electrically benign, while a number of higher energy faults, consistent with atomic-resolution micrographs, are predicted to be hole traps with fluctuations in the local electrostatic potential. It is expected that stacking faults will also be important for other thin-film photovoltaic technologies.

  12. Nanowire and core-shell-structures on flexible Mo Foil for CdTe solar cell applications

    OpenAIRE

    Williams, Ben; Durose, Ken; Kartopu, Giray; Barrioz, Vincent; Lamb, Daniel; Irvine, Stuart; Zoppi, Guillaume; Forbes, Ian

    2011-01-01

    CdTe films, nanowires, film-nanowire combinations and CdS-CdTe core-shell structures have been fabricated in a preliminary survey of growth methods that will generate structures for PV applications. Selectivity between film, nanowire and film plus nanowire growth was achieved by varying the pressure of N2 gas present during Au-catalysed VLS growth of CdTe, on either Mo or Si substrates. Metamorphic growth of CdTe nanowires on sputtered CdTe films, deposited on glass substrates, was demonstrat...

  13. Variable temperature semiconductor film deposition

    Science.gov (United States)

    Li, Xiaonan; Sheldon, Peter

    1998-01-01

    A method of depositing a semiconductor material on a substrate. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  14. Modeling the defect distribution and degradation of CdTe ultrathin films

    Science.gov (United States)

    Gorji, Nima E.

    2014-12-01

    The defect distribution across an ultrathin film CdTe layer of a CdS/CdTe solar cell is modelled by solving the balance equation in steady state. The degradation of the device parameters due to the induced defects during ion implantation is considered where the degradation rate is accelerated if the defect distribution is considerable. The defect concentration is maximum at the surface of the CdTe layer where implantation is applied and it is minimum at the junction with the CdS layer. It shows that ultrathin devices degrade faster if the defect concentration is high at the junction rather than the back region (CdTe/Metal). Since the front and back contacts of the device are close in ultrathin films and the electric field is strong to drive the defects into the junction, the p-doping process might be precisely controlled during ion implantation. The modeling results presented here are in agreement with the few available experimental reports in literature about the degradation and defect configuration of the ultrathin CdTe films.

  15. Analysis of post deposition processing for CdTe/CdS thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    McCandless, B.E.; Birkmire, R.W. (Inst. of Energy Conversion, Univ. of Delaware, Newark, DE (United States))

    1991-12-01

    A post-deposition process for optimizing the efficiency of thin film CdTe/CdS solar cells deposited by physical vapor deposition has been developed and the effects of the individual process steps on the materials and device properties have been analyzed. A 400degC heat treatment with CdCl{sub 2} restructures the CdTe resulting in enhanced grain size and crystallographic reorientation. Structural and optical measurements indicate interdiffusion of sulfur and tellurium during the heat treatment resulting in formation of a CdS{sub x}Te{sub 1-x} layer with a narrower band gap than CdTe. Bifacial current-voltage and quantum efficiency analysis of the CdTe devices at various stages of the optimization process shows the evolution of the device from a p-i-n structure to a heterojunction. A chemical treatment improves the open circuit voltage (V{sub oc}) and Cu/Au contact to the CdTe. The optimization process can be applied to cells using CdTe and CdS deposited by different methods. (orig.).

  16. Fabrication of solar cells based on polycrystalline CdTe thin films using an economical production. Energie

    Energy Technology Data Exchange (ETDEWEB)

    Tranchart, J.C.; Boucherez, P.

    1983-01-01

    Polycrystalline CdS and CdTe films were produced by serigraphy. High-quality CdS films were obtained, especially with CdCl as melting phase. In the field of CdTe films, further studies are required in order to improve the sintering process, the film porosity characteristics, and the electric resistivity which decides the serial conductivity of the n-CdS/p-CdTe structures. In the field of solar cells, quartz +In/sub 2/O/sub 3/+CdS+CdTe heterostructures with a photoelectric efficiency of 2.5% were obtained. This value is too low, even if the economic advantages of serigraphy are taken into account. Further studies should center on the sintering process for CdTe films.

  17. High-Efficiency CdTe and CIGS Thin-Film Solar Cells: Highlights and Challenges; Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Noufi, R.; Zweibel, K.

    2006-05-01

    Thin-film photovoltaic (PV) modules of CdTe and Cu(In,Ga)Se2 (CIGS) have the potential to reach cost-effective PV-generated electricity. These technologies have transitioned from the laboratory to the market place. Pilot production and first-time manufacturing are ramping up to higher capacity and enjoying a flood of venture-capital funding. CIGS solar cells and modules have achieved 19.5% and 13% efficiencies, respectively. Likewise, CdTe cells and modules have reached 16.5% and 10.2% efficiencies, respectively. Even higher efficiencies from the laboratory and from the manufacturing line are only a matter of time. Manufacturing-line yield continues to improve and is surpassing 85%. Long-term stability has been demonstrated for both technologies; however, some failures in the field have also been observed, emphasizing the critical need for understanding degradation mechanisms and packaging options. The long-term potential of the two technologies require R&D emphasis on science and engineering-based challenges to find solutions to achieve targeted cost-effective module performance, and in-field durability. Some of the challenges are common to both, e.g., in-situ process control and diagnostics, thinner absorber, understanding degradation mechanisms, protection from water vapor, and innovation in high-speed processing and module design. Other topics are specific to the technology, such as lower-cost and fast-deposition processes for CIGS, and improved back contact and voltage for CdTe devices.

  18. Effect of thickness and cold substrate on transport properties of thermally evaporated CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    El-Mongy, A.Abd; Hashem, H.M.; Ramadan, A.A. [Physics Department, Faculty of Science, Helwan University, Helwan, Cairo (Egypt)

    2005-08-01

    The correlation between the structural characteristics (stoichiometry and crystallite size) of CdTe films and their electronic transport properties were the aims of the present study to bring attention to the dual importance of grain size and conversion of the semiconductivity type with changing film thickness. Two main parameters were considered: the substrate temperature and film thickness. Transport properties were influenced by grain boundaries as well as by native doping. Optical measurements showed two main direct transitions at energies: E{sub 1} {approx}1.55 eV (fundamental gap) and E{sub 2}{approx}2.49 eV (due to valence band splitting). Both transitions were found to be thickness dependent with a marked change at a film thickness of about 300 nm. In the case of low substrate temperature, the scaling relation between resistivity and grain size showed a deviation from linear behavior at a size of 20 nm and the transmission coefficient is reduced. Also, the deposition on cold substrate enhanced both dark and photoconductivity for films of thickness {>=}300 nm. It is also proved that the carrier transport was affected by the transmission coef-ficient for carriers to pass a single grain boundary as well as the number of grain boundaries per mean free path. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  19. Study of the Mg incorporation in CdTe for developing wide band gap Cd{sub 1-x}Mg{sub x}Te thin films for possible use as top-cell absorber in a tandem solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Martinez, Omar S. [Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, 62580 Temixco, Morelos (Mexico); Universidad Politecnica del Estado de Guerrero, Comunidad de Puente Campuzano, C.P. 40325 Taxco de Alarcon, Guerrero (Mexico); Millan, Aduljay Remolina [Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, 62580 Temixco, Morelos (Mexico); Huerta, L.; Santana, G. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico. C.P 04510 Mexico D.F. (Mexico); Mathews, N.R.; Ramon-Garcia, M.L.; Morales, Erik R. [Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, 62580 Temixco, Morelos (Mexico); Mathew, X., E-mail: xm@cie.unam.mx [Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, 62580 Temixco, Morelos (Mexico)

    2012-02-15

    Highlights: Black-Right-Pointing-Pointer Thin films of Cd{sub 1-x}Mg{sub x}Te with high spatial uniformity and band gap in the range of 1.6-1.96 eV were deposited by vacuum co-evaporation of CdTe and Mg. Black-Right-Pointing-Pointer Obtained Cd{sub 1-x}Mg{sub x}Te films have the structural characteristics of the CdTe, evidence of the change in atomic scattering due to incorporation of Mg was observed. Black-Right-Pointing-Pointer XRD and XPS data confirmed the incorporation of Mg in the lattice of CdTe. Black-Right-Pointing-Pointer SEM images revealed the impact of Mg incorporation on the morphology of the films, the changes in grain size and grain morphology are noticeable. - Abstract: Thin films of Cd{sub 1-x}Mg{sub x}Te with band gap in the range of 1.6-1.96 eV were deposited by vacuum co-evaporation of CdTe and Mg on glass substrates heated at 300 Degree-Sign C. Different experimental techniques such as XRD, UV-vis spectroscopy, SEM, and XPS were used to study the effect of Mg incorporation into the lattice of CdTe. The band gap of the films showed a clear tendency to increase as the Mg content in the film is increased. The Cd{sub 1-x}Mg{sub x}Te films maintain all the structural characteristics of the CdTe, however, diminishing of intensity for the XRD patterns is observed due to both change in preferential orientation and change in atomic scattering due to the incorporation of Mg. SEM images showed significant evidences of morphological changes due to the presence of Mg. XRD, UV-vis spectroscopy, and XPS data confirmed the incorporation of Mg in the lattice of CdTe. The significant increase in band gap of CdTe due to incorporation of Mg suggests that the Cd{sub 1-x}Mg{sub x}Te thin film is a candidate material to use as absorber layer in the top-cell of a tandem solar cell.

  20. Growth of ZnO nanowires through thermal oxidation of metallic zinc films on CdTe substrates

    Energy Technology Data Exchange (ETDEWEB)

    Martinez, O., E-mail: oscar@fmc.uva.es [Optronlab Group, Dpto. Fisica Materia Condensada, Edificio I-D, Universidad de Valladolid, Paseo de Belen 1, 47011, Valladolid (Spain); Hortelano, V.; Jimenez, J. [Optronlab Group, Dpto. Fisica Materia Condensada, Edificio I-D, Universidad de Valladolid, Paseo de Belen 1, 47011, Valladolid (Spain); Plaza, J.L.; Dios, S. de; Olvera, J.; Dieguez, E. [Laboratorio de Crecimiento de Cristales, Departamento de Fisica de Materiales, Facultad de Ciencias, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Fath, R.; Lozano, J.G.; Ben, T.; Gonzalez, D. [Dpto. Ciencia de los Materiales e Ingenieria Metalurgica y Q.I., Facultad de Ciencias, Apdo. 40, 11510 Puerto Real, Cadiz (Spain); Mass, J. [Dpto. de Fisica, Universidad del Norte, Km.5 Via Puerto Colombia, Barranquilla (Colombia)

    2011-04-28

    Research highlights: > ZnO nanowires grown from thermal Zn oxidation. > TEM reveals high quality thin nanowires several microns long. > New phase formation at long oxidation time. > Good spectroscopic properties measured by Raman, Photo and Cathodoluminsecence spectroscopies. - Abstract: <112-bar 0> wurtzite ZnO nanowires (NWs) have been obtained by oxidizing in air at 500 deg. C thermally evaporated Zn metal films deposited onto CdTe substrates. The presence of Cd atoms from the substrate on the ZnO seeding layer and NWs seems to affect the growth of the NWs. The effects of the oxidation time on the structural and optical properties of the NWs are described in detail. It is shown that the NWs density decreases and their length increases when increasing the oxidation time. Thicker Zn layers result in thinner and longer ZnO NWs. Very long oxidation times also lead to the formation of a new CdO phase which is related to the partial destruction and quality reduction of the NWs. The possible process for ZnO NW formation on CdTe substrates is discussed.

  1. Processing and characterization of large-grain thin-film CdTe

    International Nuclear Information System (INIS)

    Basic material studies addressing the growth and processing of CdTe have resulted in dense, defect-free as-grown CdTe films on 7059 glass with initial grain sizes of ∼0.2 μm. Innovations in postdeposition processing (no CdCl2) have resulted in films with >50 μm grain sizes. Scanning electron microscopy analyses confirm film density while concurrent cathodluminescence reveals a change in the recombination efficiency. Transmission electron microscopy analyses reveal that films grown below 300 degree C are defect-free, while films grown above 300 degree C contain defects. Photoluminescence lifetime measurements reveal a fivefold increase in lifetime following postdeposition processing of these films. These results were correlated with x-ray photoemission measurements of the Te 4d, Cd 4d, and valence band. This indicates that grain boundaries are the main factor limiting lifetimes. Based on these results, we have developed an understanding of the effects of oxygen and grain boundary oxides on postdeposition processing and enhanced grain growth

  2. Effect of substrate temperature on photoconductivity in CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sarmah, K.C.; Das, H.L. (Dept. of Physics, Gauhati Univ., Assam (India))

    1991-03-20

    Thin films of highly pure (99.999%) CdTe grown by vacuum evaporation on glass substrates held at elevated temperatures have been found to be polycrystalline. Within the range from liquid nitrogen temperature to 425 K two distinct conductivity regions both in the dark and under illumination have been observed in all the films having different grain sizes. From lower temperatures to 285 K the conductivity is essentially temperature independent and above 285 K the potential barriers localized at grain boundaries limit the conductivity. (orig.).

  3. Investigation of polycrystalline CdZnTe, CdMnTe, and CdTe films for photovoltaic applications

    Energy Technology Data Exchange (ETDEWEB)

    Rohatgi, A.; Ringel, S.A.; Sudharsanan, R. (School of Electrical Engineering, Georgia Inst. of Tech., Atlanta, GA (USA)); Meyers, P.V.; Liu, C.H.; Ramanthan, V. (Ametek Applied Materials Lab., Harleysville, PA (USA))

    1989-10-15

    Polycrystalline thin films of CdZnTe and CdMnTe have been grown by molecular beam epitaxy and metal-organic chemical vapor deposition, respectively, on CdS/SnO{sub 2}/glass substrates, with bandgaps of 1.65-1.75 eV for the top of a two-cell tandem design. P-i-n cells were fabricated and tested using Ni/p{sup +}-ZnTe as a back contact to the ternary films. CdTe cells were also fabricated using both growth techniques, which resulted in 9-10% efficiency and provided a baseline for ternary cell development. It was found that standard CdTe processing (400deg C air annealing) reduces the ternary bandgaps from about 1.7 to about 1.55 eV, resulting in significantly reduced subgap transmission with cell efficiencies of 3-4%. Optimum air-annealing conditions were determined to retain the 1.7 eV bandgaps; however, the cell performance was still limited by both poor CdZnTe/CdS interface quality and high series resistance. The junction interface was found to improve by annealing in the presence of hydrogen, which resulted in V{sub oc} values from 0.500 V to as high as 0.65 V, but the cell performance became increasingly limited by series resistance. The effects of cell processing on the properties of the CdZnTe/CdS interface, the bulk CdZnTe film, and the back-contact region have been investigated to provide guidelines for achieving high efficiency in widegap ternary cells. (orig.).

  4. Photoluminescence waveguiding in CdSe and CdTe QDs-PMMA nanocomposite films

    Energy Technology Data Exchange (ETDEWEB)

    Suarez, I; Gordillo, H; Abargues, R; Albert, S; Martinez-Pastor, J, E-mail: isaac.suarez@uv.es [UMDO - Unidad Asociada al CSIC-IMM, Instituto de Ciencia de los Materiales, Universidad de Valencia, PO Box 22085, 46071 Valencia (Spain)

    2011-10-28

    In this paper, active planar waveguides based on the incorporation of CdSe and CdTe nanocrystal quantum dots in a polymer matrix are demonstrated. In the case of doping the polymer with both types of quantum dots, the nanocomposite film guides both emitted colors, green (550 nm, CdTe) and orange (600 nm, CdSe). The optical pumping laser can be coupled not only with a standard end-fire coupling system, but also directing the beam to the surface of the sample, indicating a good absorption cross-section and waveguide properties. To achieve these results, a study of the nanocomposite optical properties as a function of the nanocrystal concentration is presented and the optimum conditions are found for waveguiding.

  5. Epitaxial growth of CdTe oriented thin films, infrared characterization and possible applications to photo-voltaic cells

    OpenAIRE

    Gerbaux, X.; Pianelli, A.; Hadni, A.; Jeanniard, C.; Strimer, P.

    1980-01-01

    The growth of CdTe oriented thin films by the ENSH method - i.e. Epitaxial Nucleation in Sub-microscopic Holes of an intermediate layer closely applied on a bulk single crystal — has been recently described. The CdTe films are generally difficult to detach from the bulk crystal. However free films are needed to study the infrared transmission in the spectral region of high absorption. To get them, the vitreous or amorphous thin intermediate layers are substituted by quite soluble an oriented ...

  6. Optical properties of oxygenated CdTe thin films

    Science.gov (United States)

    Zapata-Navarro, A.; Peña-Chapa, J. L.; Villagrán De León, J. C.

    1996-07-01

    Cadmium telluride oxide films (CdTe-O) were grown by a radio frequency sputtering technique on glass slide substrates using a controlled plasma (Ar-N2O). The films were studied by Auger electron spectroscopy (AES) and optical transmission. We demonstrate that the oxidation process enhances the transmittance of the films into the visible part of the spectrum depending on the oxygen concentration.

  7. Optical and electrical characterizations of highly efficient CdTe thin film solar cells prepared by close-spaced sublimation

    Science.gov (United States)

    Okamoto, T.; Yamada, A.; Konagai, M.

    2000-06-01

    The effects of the Cu diffusion on the optical and electrical properties of CdTe thin film solar cells prepared by close-spaced sublimation (CSS) were investigated by capacitance-voltage ( C- V) measurement and low-temperature photoluminescence (PL) measurement. C- V measurement revealed that the net acceptor concentration in the CdTe layer was independent of the heat treatment after screen printing of the Cu-doped graphite electrode for Cu diffusion into the CdTe layer, although it greatly affected the solar cell performance. Furthermore, the depth profile of PL spectrum of CdTe layer implies that the heat treatment for Cu diffusion facilitates the formation of low-resistance contact to CdTe through the formation of a heavily doped (p +) region in the CdTe adjacent to the back electrode, but Cu atoms do not act as effective acceptors in the CdTe layer except the region near the back electrode.

  8. Biaxially oriented CdTe films on glass substrate through nanostructured Ge/CaF2 buffer layers

    Science.gov (United States)

    Lord, R. J.; Su, P.-Y.; Bhat, I.; Zhang, S. B.; Lu, T.-M.; Wang, G.-C.

    2015-09-01

    Heteroepitaxial CdTe films were grown by metal organic chemical vapor deposition on glass substrates through nanostructured Ge/CaF2 buffer layers which were biaxially oriented. It allows us to explore the structural properties of multilayer biaxial semiconductor films which possess small angle grain boundaries and to test the principle of a solar cell made of such low-cost, low-growth-temperature semiconductor films. Through the x-ray diffraction and x-ray pole figure analysis, the heteroepitaxial relationships of the mutilayered films are determined as [111] in the out-of-plane direction and CdTe//Ge//{ }{{{CaF}}2} in the in-plane direction. The I-V curves measured from an ITO/CdS/CdTe/Ge/CaF2/glass solar cell test structure shows a power conversion efficiency of ˜η = 1.26%, illustrating the initial success of such an approach. The observed non-ideal efficiency is believed to be due to a low shunt resistance and high series resistance as well as some residual large-angle grain boundary effects, leaving room for significant further improvement.

  9. Nanofriction properties of molecular deposition films

    Institute of Scientific and Technical Information of China (English)

    王强斌; 高芒来; 张嗣伟

    2000-01-01

    The nanofriction properties of Au substrate and monolayer molecular deposition film and multilayer molecular deposition films on Au substrate and the molecular deposition films modified with alkyl-terminal molecule have been investigated by using an atomic force microscope. It is concluded that ( i ) the deposition of molecular deposition films on Au substrate and the modification of alkyl-terminal molecule to the molecular deposition films can reduce the frictional force; (ii) the molecular deposition films with the same terminal exhibit similar nanofriction properties, which has nothing to do with the molecular chain-length and the layer number; (iii) the unstable nanofriction properties of molecular deposition films are contributed to the active terminal of the molecular deposition film, which can be eliminated by decorating the active molecular deposition film with alkyl-terminal molecule, moreover, the decoration of alkyl-terminal molecule can lower the frictional force conspicuously; (iv) the relat

  10. The activation of thin film CdTe solar cells using alternative chlorine containing compounds

    Energy Technology Data Exchange (ETDEWEB)

    Maniscalco, B., E-mail: B.Maniscalco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering (United Kingdom); Abbas, A.; Bowers, J.W.; Kaminski, P.M.; Bass, K. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering (United Kingdom); West, G. [Department of Materials, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering (United Kingdom)

    2015-05-01

    The re-crystallisation of thin film cadmium telluride (CdTe) using cadmium chloride (CdCl{sub 2}) is a vital process for obtaining high efficiency photovoltaic devices. However, the precise micro-structural mechanisms involved are not well understood. In this study, we have used alternative chlorine-containing compounds to determine if these can also assist the re-crystallisation of the CdTe layer and to understand the separate roles of cadmium and chlorine during the activation. The compounds used were: tellurium tetrachloride (TeCl{sub 4}), cadmium acetate (Cd(CH{sub 3}CO{sub 2}){sub 2}), hydrochloric acid (HCl) and zinc chloride (ZnCl{sub 2}). TeCl{sub 4} was used to assess the role of Cl and the formation of a Te-rich outer layer which may assist the formation of the back contact. (Cd(CH{sub 3}CO{sub 2}){sub 2}) and HCl were used to distinguish between the roles of cadmium and chlorine in the process. Finally, ZnCl{sub 2} was employed as an alternative to CdCl{sub 2}. We report on the efficacy of using these alternative Cl-containing compounds to remove the high density of planar defects present in untreated CdTe. - Highlights: • Cadmium chloride (CdCl{sub 2}) activation treatment • Alternative chlorine containing compounds • Microstructure analysis and electrical performances.

  11. Growth and Characterization of CdTe Thin Films on CdS/TCO/glass superstrate

    Science.gov (United States)

    Oladeji, Isaiah O.; Chow, Lee; Zhou, Dan; Stevie, Fred

    1998-11-01

    The performance of CdTe/CdS/TCO/glass structure which is generally used as a solar cell depends on the impurities incorporated in the system before and after electrodeposition of CdTe thin films. In this report we present a detailed investigation of this structure using secondary ion mass spectrometry(SIMS), x-ray microanalysis, x-ray diffraction(XRD), and scanning electron microscopy(SEM) to identify those impurities. We also discuss possible ways of minimizing or eliminating some of these impurities in order to improve the cell efficiency.

  12. Electronic structure of electrodeposited thin film CdTe solar cells

    Science.gov (United States)

    Ullal, H. S.

    1988-05-01

    Independent experimental verification done at four research laboratories, namely, Ametek, Colorado State University (CSU), Institute of Energy Conversion (IEC), and Solar Energy Research Institute (SERI) confirm the n-i-p model proposed by Ametek. The experiments done for the verification of the n-i-p structure are the high frequency capacitance-voltage, light and voltage bias quantum efficiency, and EBIC measurements. All experimental evidence suggests that the n-i-p model is appropriate for the existing n-CdS/i-CdTe/p-ZnTe cell structure. From the C-V measurements, the depletion width has been estimated at 1.7 to 2.0 microns and corresponds to the thickness of the CdTe film. This unique thin films device design has resulted in improved stability and a SERI-verified world record single-junction total area AM1.5 global efficiency of 11 percent. Further refinements in device design and cell processing should result in 12 to 13 percent efficiencies for thin-film CdTe solar cells in the not-too-distant future.

  13. Electronic structure of electrodeposited thin film CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ullal, H.S.

    1988-05-01

    Independent experimental verification done at four research laboratories, namely, Ametek, Colorado State University (CSU), Institute of Energy Conversion (IEC), and Solar Energy Research Institute (SERI) confirm the n-i-p model proposed by Ametek. The experiments done for the verification of the n-i-p structure are the high frequency capacitance-voltage, light and voltage bias quantum efficiency, and EBIC measurements. All experimental evidence suggests that the n-i-p model is appropriate for the existing n-CdS/i-CdTe/p-ZnTe cell structure. From the C-V measurements, the depletion width has been estimated at 1.7-2.0 ..mu..m and corresponds to the thickness of the CdTe film. This unique thin films device design has resulted in improved stability and a SERI-verified world record single-junction total area AM1.5 global efficiency of 11%. Further refinements in device design and cell processing should result in 12-13% efficiencies for thin-film CdTe solar cells in the not-too-distant future.

  14. Electrochemical deposition and characterization of phosphorous doped p-CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Balakrishnan, K.S.; Rastogi, A.C. (National Physical Lab., New Delhi (India))

    1991-11-01

    An electrodeposition process for formation of low resistivity phosphorous doped p-type CdTe films is described. The deposition is carried out in organic electrolyte which enables ionic doping by phosphorous in situ with the growth of CdTe films. Te to P atomic ratios in the film, their electrolytic concentrations and activation energy analysis establishes that p-conversion is due to acceptor states at E{sub v} +0.05 eV formed by P atoms selectively occupying Te sites in CdTe. The lower resistivity limit of 5-10 {Omega} cm of p-CdTe films is set by generation of interstitial P related defects if the P concentration exceeds a threshold value of 6x10{sup -4} M. Analysis of space charge limited current transport in these films establishes hole concentrations of 8x10{sup 16} cm{sup -3} and associated low defect densities around 9x10{sup 14} cm{sup -3} obtained through good stoichiometric control inherent to this technique. Codeposition of P modifies nucleation and growth, resulting in p-CdTe films having hexagonal structure and oriented crystallites of over 0.8 {mu}m grain size. Due to these properties p-CdTe films are well suited for application to solar cells. (orig.).

  15. Influence of thermal treatment temperatures on CdTe nanocrystal films and photoelectric properties of ITO/CdTe/Al

    Institute of Scientific and Technical Information of China (English)

    Xu Wenqing; Qu Shengchun; Wang Kefan; Bi Yu; Liu Kong; Wang Zhanguo

    2012-01-01

    The influence of sintering temperatures on solution-processed cadmium telluride (CdTe) nanocrystal films is studied in order to maximize the performance of CdTe/Al Schottky nanocrystal solar cells,The best overall performance of 2.67% efficiency at air mass 1.5 was achieved from devices with CdTe films sintered at 350 ℃ X-ray diffraction,scanning electron microscopy and UV-vis absorption measurements show that the CdTe nanocrystal grains began to grow remarkably well when sintering temperatures increased to 350 ℃.By analyzing the current-voltage characteristics,we find that the short-circuit current densities of devices increase with sintering temperatures ranging from 200 to 400 ℃,but,the over-sintered (450 ℃) treatment induces the shunting of devices.

  16. Preparation and Characterization of RF Magntron Sputtering CdTe Thin Film%CdTe薄膜的射频磁控溅射制备及表征

    Institute of Scientific and Technical Information of China (English)

    王波; 张静全; 王生浩; 冯良桓; 雷智; 武莉莉; 李卫; 黎兵; 曾广根

    2011-01-01

    The cadmium telluride thin film was deposited on glass substrate at room teperature by RF magnetron sputtering. The film was characterized to show the variation of its properties with the diverse deposition conditions by X-ray diffraction, UV-VIS spectrometer, scanning electrical microscope, etc. The result indicates that thc deposition speed increases with the increase of deposition power and decreases with the increase of pressure. As the pressure decreases, the CdTe film' s crystallinity gets worse. It is found that the cubic crystalline structure of deposited sample changes to the crystalline hexagonal CdTe phase as the power increased from 100 W to140 W. While the CdTe thin films is deposited under the pressure of 0.3 Pa, with the power of 100 W and at room temperature, the crystallinity is the best and the band gap is 1.45 eV.%采用射频磁控溅射技术制备了Cdre薄膜,使用探针式台阶仪、X射线衍射分析仪、紫外可见分光光度计、扫描电镜等表征了薄膜的厚度、结构、透过率、表面形貌等随溅射工艺的变化.结果表明:沉积速率随着功率的增加而增加,随气压的增加而呈线性减小;薄膜的结晶程度随气压增大而降低;功率从100W增大到180 W,出现了CdTe薄膜晶相从立方相向六方相的转变;当沉积条件为纯氩气氛、气压0.3Pa、功率100W、室温时,沉积的CdTe薄膜结晶性能最好.

  17. Characterization of thin film CdS-CdTe solar cells. [CDS-CDTE

    Energy Technology Data Exchange (ETDEWEB)

    Singh, V.P.; Brafman, H.; Makwana, J. (Texas Univ., El Paso (USA). Dept. of Electrical Engineering); McClure, J.C. (Texas Univ., El Paso, TX (USA). Metallurgical and Materials Engineering Dept.)

    1991-02-01

    Current-voltage, junction capacitance and optical characteristics of thin film CdS-CdTe cells on sprayed CdS films were measured. These characteristics have some interesting features such as reversal of the polarity of the a.c. short-circuit current and the a.c. open-circuit voltage when a large forward bias is applied across the cell. The reverse saturation current density j{sub 0} increases from 5.9x10{sup -9} A cm{sup -2} in the dark to 18.1x10{sup -6} A cm{sup -2} under '1 sun' illumination. Diode ideality factors are higher than 2.0 and the slope {alpha} of log I vs. V curve is almost temperature independent. The zero-bias depletion layer width is 1.9 {mu}m. The experimental results are interpreted by a model which proposes a highly compensated layer in CdTe and a high space charge layer in CdTe next to the CdS-CdTe interface. The origin of the high space charge layer is thought to be the ionization of a deep trap level at energy E{sub T} below the conduction band edge. For our calculations, we have used E{sub T}=0.45 eV. (orig.).

  18. Rectification and tunneling effects enabled by Al{sub 2}O{sub 3} atomic layer deposited on back contact of CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Jun; Lin, Qinxian; Li, Hao; Su, Yantao; Yang, Xiaoyang; Wu, Zhongzhen; Zheng, Jiaxin; Wang, Xinwei; Lin, Yuan; Pan, Feng, E-mail: panfeng@pkusz.edu.cn [School of Advanced Materials, Peking University Shenzhen Graduate School, Peking University, Shenzhen 518055 (China)

    2015-07-06

    Atomic layer deposition (ALD) of Aluminum oxide (Al{sub 2}O{sub 3}) is employed to optimize the back contact of thin film CdTe solar cells. Al{sub 2}O{sub 3} layers with a thickness of 0.5 nm to 5 nm are tested, and an improved efficiency, up to 12.1%, is found with the 1 nm Al{sub 2}O{sub 3} deposition, compared with the efficiency of 10.7% without Al{sub 2}O{sub 3} modification. The performance improvement stems from the surface modification that optimizes the rectification and tunneling of back contact. The current-voltage analysis indicates that the back contact with 1 nm Al{sub 2}O{sub 3} maintains large tunneling leakage current and improves the filled factor of CdTe cells through the rectification effect. XPS and capacitance-voltage electrical measurement analysis show that the ALD-Al{sub 2}O{sub 3} modification layer features a desired low-density of interface state of 8 × 10{sup 10 }cm{sup −2} by estimation.

  19. Rectification and tunneling effects enabled by Al2O3 atomic layer deposited on back contact of CdTe solar cells

    Science.gov (United States)

    Liang, Jun; Lin, Qinxian; Li, Hao; Su, Yantao; Yang, Xiaoyang; Wu, Zhongzhen; Zheng, Jiaxin; Wang, Xinwei; Lin, Yuan; Pan, Feng

    2015-07-01

    Atomic layer deposition (ALD) of Aluminum oxide (Al2O3) is employed to optimize the back contact of thin film CdTe solar cells. Al2O3 layers with a thickness of 0.5 nm to 5 nm are tested, and an improved efficiency, up to 12.1%, is found with the 1 nm Al2O3 deposition, compared with the efficiency of 10.7% without Al2O3 modification. The performance improvement stems from the surface modification that optimizes the rectification and tunneling of back contact. The current-voltage analysis indicates that the back contact with 1 nm Al2O3 maintains large tunneling leakage current and improves the filled factor of CdTe cells through the rectification effect. XPS and capacitance-voltage electrical measurement analysis show that the ALD-Al2O3 modification layer features a desired low-density of interface state of 8 × 1010 cm-2 by estimation.

  20. Band diagrams and performance of CdTe solar cells with a Sb2Te3 back contact buffer layer

    OpenAIRE

    Songbai Hu; Zhe Zhu; Wei Li; Lianghuan Feng; Lili Wu; Jingquan Zhang; Jingjing Gao

    2011-01-01

    Sb2Te3 thin films were prepared by vacuum co-evaporation and the crystallinity of the films was greatly improved after annealing at 573 K in N2 ambient. Then they were deposited on the CdTe thick films. Band diagrams of the as-deposited and annealed CdTe/Sb2Te3 interfaces were constructed. Consequently, Sb2Te3 was used as a back contact layer for CdTe thin film solar cells and the cell performance was investigated. It was found that the Sb impurities accumulated in the CdTe grain boundaries d...

  1. Studies of key technologies for CdTe solar modules

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    In this paper, CdS thin films, which act as the window layer and n-type partner to the p-type CdTe layer, were prepared by chemical bath deposition (CBD). CdTe thin films were deposited by the close-spaced sublimation (CSS) method. To obtain high-quality back contacts, a Te-rich layer was created with chemical etching and back contact materials were applied after CdTe annealing. The results indicate that the ZnTe/ZnTe:Cu complex layers show superior performance over other back contacts. Finally, by using laser scribing and mechanical scribing, the CdTe mini-modules were fabricated, in which a glass/SnO2:F/CdS/CdTe/ZnTe/ZnTe:Cu/Ni solar module with a PWQC-confirmed total-area efficiency of 7.03% (54 cm2) was achieved.

  2. Vapor phase epitaxy of CdTe on sapphire and GaAs

    Science.gov (United States)

    Kasuga, Masanobu; Futami, Hiroyuki; Iba, Yoshihiro

    1991-12-01

    CdTe films were deposited on three kinds of sapphire substrate and two kinds of GaAs substrate by open tube vapor transport. X-ray Laue diffraction study showed that CdTe(111) film grew on every kind of sapphire substrate used, i.e. on the (0001) basal plane, the (11 overline20)A plane and the (1 overline102)R plane, and that there exist a few degrees of tilt angel between CdTe(111) and the lattice plane of each substrate. The process of making the tilt angle may be explained by the atomistic mismatch model of the Cd and Al arrangement which is projected on the film-substrate interface. On GaAs(100), either CdTe(111) or CdTe(100) was obtained, whereas only a twin crystalline film was obtained on GaAs(111). These results are also consistent with the mismatch model of Cd and Ga atoms.

  3. CdTe Thin Film Solar Cells and Modules Tutorial; NREL (National Renewable Energy Laboratory)

    Energy Technology Data Exchange (ETDEWEB)

    Albin, David S.

    2015-06-13

    This is a tutorial presented at the 42nd IEEE Photovoltaics Specialists Conference to cover the introduction, background, and updates on CdTe cell and module technology, including CdTe cell and module structure and fabrication.

  4. Purified water etching of native oxides on heteroepitaxial CdTe thin films

    Science.gov (United States)

    Meinander, Kristoffer; Carvalho, Jessica L.; Miki, Carley; Rideout, Joshua; Jovanovic, Stephen M.; Devenyi, Gabriel A.; Preston, John S.

    2014-12-01

    The etching of native oxides on compound semiconductors is an important step in the production of electronic and optoelectronic devices. Although it is known that the native oxide on CdTe can be etched through a rinsing in purified water, a deeper investigation into this process has not been done. Here we present results on both surface morphology changes and reaction rates for purified water etching of the native oxide on heteroepitaxial CdTe thin films, as studied by atomic force microscopy and x-ray photoelectron spectroscopy. Together with a characterization of both the structure and stoichiometry of the initial native oxide, we show how an altering of the pH-level of the etchant will affect the etching rates. If oxide regrowth was allowed, constant etching rates could be observed for all etchants, while a logarithmic decrease in oxide thickness was observed if regrowth was inhibited. Both acidic and basic etchants proved to be more efficient than neutral water.

  5. CdTe Photovoltaics for Sustainable Electricity Generation

    Science.gov (United States)

    Munshi, Amit; Sampath, Walajabad

    2016-04-01

    Thin film CdTe (cadmium telluride) is an important technology in the development of sustainable and affordable electricity generation. More than 10 GW of installations have been carried out using this technology around the globe. It has been demonstrated as a sustainable, green, renewable, affordable and abundant source of electricity. An advanced sublimation tool has been developed that allows highly controlled deposition of CdTe films onto commercial soda lime glass substrates. All deposition and treatment steps can be performed without breaking the vacuum within a single chamber in an inline process that can be conveniently scaled to a commercial process. In addition, an advanced cosublimation source has been developed to allow the deposition of ternary alloys such as Cd x Mg1-x Te to form an electron reflector layer which is expected to address the voltage deficits in current CdTe devices and to achieve very high efficiency. Extensive materials characterization, including but not limited to scanning electron microscopy, transmission electron microscopy, energy dispersive x-ray spectroscopy, high resolution transmission electron microscopy and electron back-scatter diffraction, has been performed to get a better understanding of the effects of processing conditions on CdTe thin film photovoltaics. This combined with computer modeling such as density function theory modeling gives a new insight into the mechanism of CdTe photovoltaic function. With all these efforts, CdTe photovoltaics has seen great progress in the last few years. Currently, it has been recorded as the cheapest source of electricity in the USA on a commercial scale, and further improvements are predicted to further reduce the cost while increasing its utilization. Here, we give an overview of the advantages of thin film CdTe photovoltaics as well as a brief review of the challenges that need to be addressed. Some fundamental studies of processing conditions for thin film CdTe are also presented

  6. CdTe Photovoltaics for Sustainable Electricity Generation

    Science.gov (United States)

    Munshi, Amit; Sampath, Walajabad

    2016-09-01

    Thin film CdTe (cadmium telluride) is an important technology in the development of sustainable and affordable electricity generation. More than 10 GW of installations have been carried out using this technology around the globe. It has been demonstrated as a sustainable, green, renewable, affordable and abundant source of electricity. An advanced sublimation tool has been developed that allows highly controlled deposition of CdTe films onto commercial soda lime glass substrates. All deposition and treatment steps can be performed without breaking the vacuum within a single chamber in an inline process that can be conveniently scaled to a commercial process. In addition, an advanced cosublimation source has been developed to allow the deposition of ternary alloys such as Cd x Mg1- x Te to form an electron reflector layer which is expected to address the voltage deficits in current CdTe devices and to achieve very high efficiency. Extensive materials characterization, including but not limited to scanning electron microscopy, transmission electron microscopy, energy dispersive x-ray spectroscopy, high resolution transmission electron microscopy and electron back-scatter diffraction, has been performed to get a better understanding of the effects of processing conditions on CdTe thin film photovoltaics. This combined with computer modeling such as density function theory modeling gives a new insight into the mechanism of CdTe photovoltaic function. With all these efforts, CdTe photovoltaics has seen great progress in the last few years. Currently, it has been recorded as the cheapest source of electricity in the USA on a commercial scale, and further improvements are predicted to further reduce the cost while increasing its utilization. Here, we give an overview of the advantages of thin film CdTe photovoltaics as well as a brief review of the challenges that need to be addressed. Some fundamental studies of processing conditions for thin film CdTe are also presented

  7. Recrystallization of PVD CdTe Thin Films Induced by CdCl2 Treatment -- A Comparison Between Vapor and Solution Processes: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Mountinho, H. R.; Dhere, R. G.; Romero, M. J.; Jiang, C. S.; To, B.; Al-Jassim, M. M.

    2008-05-01

    This paper describes the large concentration of 60..deg.. <111> twin boundaries that was observed in every CdTe film analyzed in this work, even after recrystallization and grain growth, confirming the low energy of these interfaces.

  8. Development of high-efficiency, thin-film CdTe solar cells. Final subcontract report, 1 February 1992--30 November 1995

    Energy Technology Data Exchange (ETDEWEB)

    Rohatgi, A.; Chou, H.C.; Kamra, S.; Bhat, A. [Georgia Inst. of Tech., Atlanta, GA (United States)

    1996-01-01

    This report describes work performed by the Georgia Institute of Technology (GIT) to bring the polycrystalline CdTe cell efficiency a step closer to the practically achievable efficiency of 18% through fundamental understanding of detects and loss mechanisms, the role of chemical and heat treatments, and investigation of now process techniques. The objective was addressed by a combination of in-depth characterization, modeling, materials growth, device fabrication, and `transport analyses of Au/Cu/CdTe/CdS/SnO {sub 2} glass front-wall heterojunction solar cells. GiT attempted to understand the loss mechanism(s) in each layer and interface by a step-by-step investigation of this multilayer cell structure. The first step was to understand, quantify, and reduce the reflectance and photocurrent loss in polycrystalline CdTe solar calls. The second step involved the investigation of detects and loss mechanisms associated with the CdTe layer and the CdTe/CdS interface. The third stop was to investigate the effect of chemical and heat treatments on CdTe films and cells. The fourth step was to achieve a better and reliable contact to CdTe solar cells by improving the fundamental understanding. Of the effects of Cu on cell efficiency. Finally, the research involved the investigation of the effect of crystallinity and grain boundaries on Cu incorporation in the CdTe films, including the fabrication of CdTe solar calls with larger CdTe grain size.

  9. Research Leading to High Throughput Manufacturing of Thin-Film CdTe PV Modules: Annual Subcontract Report, September 2004--September 2005

    Energy Technology Data Exchange (ETDEWEB)

    Powell, R. C.

    2006-04-01

    Specific overall objectives of this subcontract are improvement in baseline field performance of manufactured CdTe PV modules while reducing environmental, health and safety risk in the manufacturing environment. Project objectives focus on four broad categories: (1) development of advanced front-contact window layers, (2) improved semiconductor film deposition, (3) development of improved accelerated life test procedures that indicate baseline field performance, and (4) reduction of cadmium-related environmental, health and safety risks. First Solar has significantly increased manufacturing capacity from less than 2 MW/yr to more than 20 MW/yr, while increasing the average module total-area power conversion efficiency from 7% to >9%. First Solar currently manufactures and sells 50-65-W thin-film CdTe PV modules at a rate of about 1.9 MW/month. Sales backlog (booked sales less current inventory divided by production rate) is more than a year. First Solar is currently building new facilities and installing additional equipment to increase production capacity by 50 MW/yr; the additional capacity is expected to come on line in the third quarter of 2006.

  10. Minerals deposited as thin films

    International Nuclear Information System (INIS)

    Free matrix effects are due to thin film deposits. Thus, it was decided to investigate this technique as a possibility to use pure oxide of the desired element, extrapolating its concentration from analytical curves made with avoiding, at the same time, mathematical corrections. The proposed method was employed to determine iron and titanium concentrations in geological samples. The range studied was 0.1-5%m/m for titanium and 5-20%m/m for iron. For both elements the reproducibility was about 7% and differences between this method and other chemical determinations were 15% for titanium and 7% for iron. (Author)

  11. Nanofriction properties of molecular deposition films

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    The nanofriction properties of Au substrate and monolayer molecular deposition film and multilayer molecular deposition films on Au substrate and the molecular deposition films modified with alkyl-terminal molecule have been investigated by using an atomic force microscope. It is concluded that (ⅰ) the deposition of molecular deposition films on Au substrate and the modification of alkyl-terminal molecule to the molecular deposition films can reduce the frictional force; (ⅱ) the molecular deposition films with the same terminal exhibit similar nanofriction properties, which has nothing to do with the molecular chain-length and the layer number; (ⅲ) the unstable nanofriction properties of molecular deposition films are contributed to the active terminal of the molecular deposition film, which can be eliminated by decorating the active molecular deposition film with alkyl-terminal molecule, moreover, the decoration of alkyl-terminal molecule can lower the frictional force conspicuously; (ⅳ) the relative humidity affects the frictional force; the higher the RH, the lower the frictional force.

  12. Efficient generation of 480 fs electrical pulses on transmission lines by photoconductive switching in metalorganic chemical vapor deposited CdTe

    Science.gov (United States)

    Nuss, Martin C.; Kisker, D. W.; Smith, P. R.; Harvey, T. E.

    1989-01-01

    Electrical pulses of only 480 fs duration have been generated by photoconductive switching in CdTe grown by ultraviolet-enhanced metalorganic chemical vapor deposition (MOCVD). In addition to the extremely fast switching times, MOCVD CdTe also exhibits a high mobility of 180 sq cm/V s and can be grown on almost any substrate, making it ideal for integration into existing circuits and devices.

  13. Study on pulsed excimer laser deposited films

    CERN Document Server

    Liu Jing Ru; Li Tie Jun; Yao Dong Sheng; Wang Li Ge; Yuan Xiao; Wang Sheng; Ye Xi Sheng

    2002-01-01

    Pulsed lasers of two different durations (30 ns, 500 fs) are used to deposit Hydrogen-free Diamond Like Carbon (DLC) films over large areas. Analysis of DLC films shows remarkable mechanical, optical, electrical, and chemical properties that are close to those of diamond. By optical emission spectroscopy and ion probe, the effects of plasma characteristic on DLC film are on experimentally studied. Amorphous silicon films deposited by PLD are also experimentally studied

  14. Pulsed laser deposition: Prospects for commercial deposition of epitaxial films

    Energy Technology Data Exchange (ETDEWEB)

    Muenchausen, R.E.

    1999-03-01

    Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique for the deposition of thin films. The vapor source is induced by the flash evaporation that occurs when a laser pulse of sufficient intensity (about 100 MW/cm{sup 2}) is absorbed by a target. In this paper the author briefly defines pulsed laser deposition, current applications, research directed at gaining a better understanding of the pulsed laser deposition process, and suggests some future directions to enable commercial applications.

  15. Energetic deposition of thin metal films

    CERN Document Server

    Al-Busaidy, M S K

    2001-01-01

    deposited films. The primary aim of this thesis was to study the physical effect of energetic deposition metal thin films. The secondary aim is to enhance the quality of the films produced to a desired quality. Grazing incidence X-ray reflectivity (GIXR) measurements from a high-energy synchrotron radiation source were carried out to study and characterise the samples. Optical Profilers Interferometery, Atomic Force Microscope (AFM), Auger electron spectroscopy (AES), Medium energy ion spectroscopy (MEIS), and the Electron microscope studies were the other main structural characterisation tools used. AI/Fe trilayers, as well as multilayers were deposited using a Nordico planar D.C. magnetron deposition system at different voltage biases and pressures. The films were calibrated and investigated. The relation between energetic deposition variation and structural properties was intensely researched. Energetic deposition refers to the method in which the deposited species possess higher kinetic energy and impact ...

  16. CdTe devices and method of manufacturing same

    Science.gov (United States)

    Gessert, Timothy A.; Noufi, Rommel; Dhere, Ramesh G.; Albin, David S.; Barnes, Teresa; Burst, James; Duenow, Joel N.; Reese, Matthew

    2015-09-29

    A method of producing polycrystalline CdTe materials and devices that incorporate the polycrystalline CdTe materials are provided. In particular, a method of producing polycrystalline p-doped CdTe thin films for use in CdTe solar cells in which the CdTe thin films possess enhanced acceptor densities and minority carrier lifetimes, resulting in enhanced efficiency of the solar cells containing the CdTe material are provided.

  17. Multiwafer growth of CdTe on GaAs by metalorganic chemical vapor deposition in a vertical, high-speed, rotating disk reactor

    Science.gov (United States)

    Tompa, G. S.; Nelson, C. R.; Saracino, M. A.; Colter, P. C.; Anderson, P. L.

    1989-07-01

    Growth by the MOCVD (at temperatures between 308 and 402 C) of CdTe (111) layers on GaAs (100) and GaAs (111) substrates in a commercial vertical high-speed rotating disk reactor was investigated, using dimethylcadmium (DMCd) and diisopropyltelluride as the growth precursors. For growth temperatures greater than 368 C, DMCd molar growth efficiencies greater than 50 percent were obtained. Results of SEM, IR spectroscopy, and FIR reflectivity examinations indicate that the CdTe films obtained in the vertical reactor were more uniform and of higher quality than the best films produced in a horizontal reactor using similar growth procedures.

  18. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  19. Fabrication of CdTe solar cells by laser-driven physical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.; Bhat, A.; Tabory, C.; Liu, S.; Nguyen, M.; Aydinli, A.; Tsien, L.H.; Bohn, R.G. (Toledo Univ., OH (USA). Dept. of Physics and Astronomy)

    1991-05-01

    Polycrystalline cadmium sulfide-cadmium telluride heterojunction solar cells were fabricated for the first time using a laser-driven physical vapor deposition method. An XeCl excimer laser was used to deposit both of the II-VI semiconductor layers in a single vacuum chamber from pressed powder targets. Results are presented from optical absorption. Raman scattering, X-ray diffraction, and electrical characterization of the films. Solar cells were fabricated by deposition onto SnO{sub 2}-coated glass with top contacts produced by gold evaporation. Device performance was evaluated from the spectral quantum efficiency and current-voltage measurements in the dark and with air mass 1.5 solar illumination. (orig.).

  20. On the interpretation of {sup 57}Fe Moessbauer spectra from CdTe thin films with substitutions of Fe, In, and Sb

    Energy Technology Data Exchange (ETDEWEB)

    Yee-Madeira, H. [Centro de Investigacion y de Estudios Avanzados, IPN, Mexico City (Mexico). Dept. de Fisica]|[Depto. de Fisica, Esc. Sup. de Fisica y Matematicas (ESFM) del IPN, Edif. 9, U. P. ALM, 07738, Mexico D.F. (Mexico); Reguera, E.; Zelaya-Angel, O.; Sanchez-Sinencio, F. [Centro de Investigacion y de Estudios Avanzados, IPN, Mexico City (Mexico). Dept. de Fisica; Montiel-Sanchez, H. [Depto. de Fisica, Esc. Sup. de Fisica y Matematicas (ESFM) del IPN, Edif. 9, U. P. ALM, 07738, Mexico D.F. (Mexico); Scorzelli, R.B. [Centro Brasileiro de Pesquisas Fisicas, Rua Xavier Sigaud 150, CEP 22290, Urca, Rio de Janeiro (Brazil)

    1999-02-26

    {sup 57}Fe Moessbauer spectra of well characterized CdTe thin films with substitutions of Fe, In and Sb were recorded and interpreted according to the changes in the ionic radii and electronic properties of these substitutions relative to Cd in the CdTe framework. The literature reports of certain correlations among the iron valence, Fe{sup 2+} or Fe{sup 3+}, and the crystallinity of the films are critically discussed and an explanation of their origin is provided. The Moessbauer results also allow direct understanding of the effect of In and Sb substitutions on the properties of the films. (orig.) 22 refs.

  1. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  2. Novel ways of depositing ZnTe films by a solution growth technique

    Energy Technology Data Exchange (ETDEWEB)

    Birkmire, R.W. (Delaware Univ., Newark, DE (USA). Inst. of Energy Conversion)

    1991-06-01

    Cu-doped ZnTe films, <1000{Angstrom}, were reproducibly deposited for the first time by an electrochemical method. A CdTe/CdS/ITO/glass substrate is externally short circuited to a zinc counter electrode in an aqueous bath consisting of ZnCl{sub 2} and TeO{sub 2} to complete an electrochemical cell. Control of both pH and TeO{sub 2} concentration was necessary to deposit single phase ZnTe films. A copper complex was added to the bath to control the ZnTe conductivity and dope the films p-type. CdTe/CdS solar cells using the ZnTe:Cu as the primary contact to the CdTe have achieved efficiencies of {approximately}9%. 15 refs., 7 figs., 2 tabs.

  3. Effect of Substrate Temperature on CdTe Thin Film Property and Solar Cell Performance%衬底温度对碲化镉薄膜性质及太阳电池性能的影响

    Institute of Scientific and Technical Information of China (English)

    曹胜; 武莉莉; 冯良桓; 王文武; 张静全; 郁骁骑; 李鑫鑫; 李卫; 黎兵

    2016-01-01

    蒸汽输运法是制备高质量且大面积均匀的 CdTe 薄膜的一种优良的方法。采用自主研发的一套蒸汽输运沉积系统制备了 CdTe 多晶薄膜,并研究了衬底温度对 CdTe 薄膜性质及太阳电池性能的影响。利用 XRD、SEM、UV-Vis和Hall等测试手段研究了衬底温度对薄膜的结构、光学性质和电学性质的影响。结果表明,蒸汽输运法制备的CdTe薄膜具有立方相结构,且沿(111)方向高度择优。随着衬底温度的升高(520℃~640℃), CdTe薄膜的平均晶粒尺寸从2mm增大到约6mm, CdTe薄膜的载流子浓度也从1.93×1010 cm–3提高到2.36×1013 cm–3,说明提高衬底温度能够降低CdTe薄膜的缺陷复合,使薄膜的p型更强。实验进一步研究了衬底温度对CdTe薄膜太阳电池性能的影响,结果表明适当提高衬底温度,能够大幅度提高电池的效率、开路电压和填充因子,但是过高的衬底温度又会降低电池的长波光谱响应,导致电池转换效率的下降。经过参数优化,在衬底温度为610℃、无背接触层小面积CdTe薄膜太阳电池的转换效率达到11.2%。%Vapor transport deposition is an excellent method for preparing large area CdTe thin films with high quality and uniformity. Polycrystalline CdTe thin films were deposited by home-made vapor transport deposition system (VTD). The effects of substrate temperature on the property of CdTe film and the performance of CdTe solar cell were inves-tigated. CdTe thin films were characterized by scanning electron microscope (SEM), X-ray diffraction (XRD), UV-Vis spectrometer, and Hall Effect system. The results show that the CdTe thin films deposited by vapor transport deposi-tion are cubic phase with a preferred orientation in (111) direction. The average grain size increases from 2mm to 6mm and the carrier concentration increases from 1.93×1010 cm–3 to 2.36×1013 cm–3 when the substrate temperature increases from 520 ℃ to 620 ℃. This

  4. Highly Luminescent Hybrid SiO2-Coated CdTe Quantum Dots Retained Initial Photoluminescence Efficiency in Sol-Gel SiO2 Film.

    Science.gov (United States)

    Sun, Hongsheng; Xing, Yugui; Wu, Qinan; Yang, Ping

    2015-02-01

    A highly luminescent silica film was fabricated using tetraethyl orthosilicate (TEOS) and 3-aminopropyltrimethoxysilane (APS) through a controlled sol-gel reaction. The pre-hydrolysis of TEOS and APS which resulted in the mixture of TEOS and APS in a molecular level is a key for the formation of homogenous films. The aminopropyl groups in APS play an important role for obtaining homogeneous film with high photoluminescence (PL). Red-emitting hybrid SiO2-coated CdTe nano-crystals (NCs) were fabricated by a two-step synthesis including a thin SiO2 coating via a sol-gel process and a subsequent refluxing using green-emitting CdTe NCs. The hybrid SiO2-coated CdTe NCs were embedded in a functional SiO2 film via a two-step process including adding the NCs in SiO2 sol with a high viscosity and almost without ethanol and a subsequent spinning coating. The hybrid SiO2-coated CdTe NCs retained their initial PL efficiency (54%) in the film. Being encapsulated with the hybrid NCs in the film, no change on the absorption and PL spectra of red-emitting CdTe NCs (632 nm) was observed. This indicates the hybrid NCs is stable enough during preparation. This phenomenon is ascribed to the controlled sol-gel process and a hybrid SiO2 shell on CdTe NCs. Because these films exhibited high PL efficiency and stability, they will be utilizable for potential applications in many fields. PMID:26353691

  5. Polymer-assisted deposition of films

    Science.gov (United States)

    McCleskey,Thomas M.; Burrell,Anthony K.; Jia,Quanxi; Lin,Yuan

    2012-02-28

    A polymer assisted deposition process for deposition of metal nitride films and the like is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures under a suitable atmosphere to yield metal nitride films and the like. Such films can be conformal on a variety of substrates including non-planar substrates. In some instances, the films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  6. Photoconductivity of CdTe Nanocrystal-Based Thin Films. Te2- Ligands Lead To Charge Carrier Diffusion Lengths Over 2 Micrometers

    Energy Technology Data Exchange (ETDEWEB)

    Crisp, Ryan W. [National Renewable Energy Lab. (NREL), Golden, CO (United States); Callahan, Rebecca [National Renewable Energy Lab. (NREL), Golden, CO (United States); Reid, Obadiah G. [Univ. of Colorado, Boulder, CO (United States); Dolzhnikov, Dmitriy S. [Univ. of Chicago, IL (United States); Talapin, Dmitri V. [Univ. of Chicago, IL (United States); Rumbles, Garry [National Renewable Energy Lab. (NREL), Golden, CO (United States); Luther, Joseph M. [National Renewable Energy Lab. (NREL), Golden, CO (United States); Kopidakis, Nikos [National Renewable Energy Lab. (NREL), Golden, CO (United States)

    2015-11-16

    We report on photoconductivity of films of CdTe nanocrystals (NCs) using time-resolved microwave photoconductivity (TRMC). Spherical and tetrapodal CdTe NCs with tunable size-dependent properties are studied as a function of surface ligand (including inorganic molecular chalcogenide species) and annealing temperature. Relatively high carrier mobility is measured for films of sintered tetrapod NCs (4 cm2/(V s)). Our TRMC findings show that Te2- capped CdTe NCs show a marked improvement in carrier mobility (11 cm2/(V s)), indicating that NC surface termination can be altered to play a crucial role in charge-carrier mobility even after the NC solids are sintered into bulk films.

  7. Health, safety and environmental risks from the operation of CdTe and CIS thin-film modules

    International Nuclear Information System (INIS)

    This paper identifies the materials embedded in on a type of CIS (Copper indium diselenide) and four different types of CdTe (cadmium telluride) thin-film modules. It refers to the results of our outdoor leaching experiments on photovoltaic (PV) samples broken into small fragments. Estimations for modules accidents on the roof or in the garden of a residential house, e.g. leaching of hazardous materials into water or soil, are given. The outcomes of our estimations show some module materials released into water or oil during leaching accidents. In a worst-case scenario for CdTe modules the leached cadmium concentration in the collected water is estimated to be no higher than the German drinking water limit concentration. For the CIS module scenario the estimated leached element concentrations are about one to two orders of magnitude below the German drinking water limit concentration. For broken CIS and CdTe modules on the ground no critical increase of the natural element concentration is observed after leaching into the soil for 1 year. (Author)

  8. Orientation of CdTe epitaxial films on GaAs(100) grown by vacuum evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Houng Mauphon; Fu Shenli; Jenq Fenqlin (Dept. of Electrical Engineering, National Cheng-Kung Univ., Tainan (Taiwan)); Chen Jiannruey (Dept. of Materials Science and Engineering, National Tsing Hua Univ., Hsinchu (Taiwan))

    1991-08-15

    The growth of (100)- and (111)-oriented CdTe epitaxial layers on (100)-oriented GaAs substrates were investigated. Ar{sup +} plasma bombardment was used to remove the surface oxide layer, while preheating the substrate before evaporation was performed to deplete arsenic on the GaAs substrate surface. Results indicate that the CdTe(100) will grow on GaAs(100) with an oxide layer remaining on the surface. For the GaAs(100) substrate with the oxide layer removed by plasma bombardment, CdTe(100) will grow on the arsenic-depleted GaAs substrate, while CdTe(111) will grow on the GaAs substrate without arsenic depletion. A model is proposed that a tellurium-rich surface is formed on the arsenic-depleted GaAs surface through Ga-Te bonding on which the CdTe(100) will grow, whereas CdTe(111) will grow on a tellurium-poor surface. The photoluminescence investigation conforms to our proposed model. (orig.).

  9. Development of Combinatorial Pulsed Laser Deposition for Expedited Device Optimization in CdTe/CdS Thin-Film Solar Cells

    Directory of Open Access Journals (Sweden)

    Ali Kadhim

    2016-01-01

    Full Text Available A combinatorial pulsed laser deposition system was developed by integrating a computer controlled scanning sample stage in order to rapidly screen processing conditions relevant to CdTe/CdS thin-film solar cells. Using this system, the thickness of the CdTe absorber layer is varied across a single sample from 1.5 μm to 0.75 μm. The effects of thickness on CdTe grain morphology, crystal orientation, and cell efficiency were investigated with respect to different postprocessing conditions. It is shown that the thinner CdTe layer of 0.75 μm obtained the best power conversion efficiency up to 5.3%. The results of this work shows the importance that CdTe grain size/morphology relative to CdTe thickness has on device performance and quantitatively exhibits what those values should be to obtain efficient thin-film CdTe/CdS solar cells fabricated with pulsed laser deposition. Further development of this combinatorial approach could enable high-throughput exploration and optimization of CdTe/CdS solar cells.

  10. Perovskite thin films via atomic layer deposition.

    Science.gov (United States)

    Sutherland, Brandon R; Hoogland, Sjoerd; Adachi, Michael M; Kanjanaboos, Pongsakorn; Wong, Chris T O; McDowell, Jeffrey J; Xu, Jixian; Voznyy, Oleksandr; Ning, Zhijun; Houtepen, Arjan J; Sargent, Edward H

    2015-01-01

    A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3 NH3 PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm(-1) .

  11. Perovskite Thin Films via Atomic Layer Deposition

    KAUST Repository

    Sutherland, Brandon R.

    2014-10-30

    © 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

  12. Characterization of Highly Efficient CdTe Thin Film Solar Cells by the Capacitance-Voltage Profiling Technique

    Science.gov (United States)

    Okamoto, Tamotsu; Yamada, Akira; Konagai, Makoto

    2000-05-01

    The electrical properties of highly efficient CdTe thin film solar cells prepared by close-spaced sublimation (CSS) were investigated by capacitance-voltage (C-V) measurement. According to the dependence of the cell performance on the substrate temperature in the CSS process, the open-circuit voltage (Voc) increased with increasing the substrate temperature below 630°C@. The carrier concentration profiles revealed that the net acceptor concentration exponentially increased from the CdS/CdTe interface to the rear and that the acceptor concentration increased with increasing substrate temperature. This result suggests that Voc is improved as a result of the increase in the acceptor concentration.

  13. Thin film cadmium telluride solar cells by two chemical vapor deposition techniques

    Energy Technology Data Exchange (ETDEWEB)

    Chu, T.L.

    1988-01-15

    Cadmium telluride (CdTe) has long been recognized as a promising thin film photovoltaic material. In this work, polycrystalline p-CdTe films have been deposited by two chemical vapor deposition techniques, namely the combination of vapors of elements (CVE) and close-spaced sublimation (CSS). The CVE technique is more flexible in controlling the composition of deposited films while the CSS technique can provide very high deposition rates. The resistivity of p-CdTe films deposited by the CVE and CSS techniques can be controlled by intrinsic (cadmium vacancies) or extrinsic (arsenic or antimony) doping, and the lowest resistivity obtainable is about 200 ..cap omega.. cm. Both front-wall (CdTe/TCS/glass) and back-wall (TCS/CdTe/substrate) cells have been prepared. The back-wall cells are less efficient because of the high and irreproducible p-CdTe-substrate interface resistance. The CSS technique is superior to the CVE technique because of its simplicity and high deposition rates; however, the cleaning of the substrate in situ is more difficult. The interface cleanliness is an important factor determining the electrical and photovoltaic characteristics of the heterojunction. Heterojunction CdS/CdTe solar cells of area 1 cm/sup 2/ with conversion efficiencies higher than 10% have been prepared and junction properties characterized.

  14. Post deposition purification of PTCDA thin films

    International Nuclear Information System (INIS)

    The decomposition of perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) molecules during evaporation of unpurified raw material in ultra high vacuum was studied. The fragments were identified by mass spectrometry and the influence of these fragments and further contaminations of the raw material on the electronic structure of PTCDA thin films was measured by photoemission spectroscopy. Annealing of contaminated PTCDA films was tested as cheap and easy to perform method for (partial) post deposition purification of the contaminated films

  15. Advanced processing technology for high-efficiency, thin-film CuInSe{sub 2} and CdTe solar cells. Final subcontract report, March 1, 1992--April 30, 1995

    Energy Technology Data Exchange (ETDEWEB)

    Morel, D L; Ferekides, C S [University of South Florida, Tampa, FL (United States)

    1996-01-01

    This report describes work performed by the University of South Florida to develop a manufacturing-friendly fabrication process for CuInSe{sub 2} (CIS) solar cells. The process developed under this project uses conventional deposition processes and equipment, does not require stringent process control, and uses elemental Se as the selenium source. The authors believe it can be readily scaled up using off-the-shelf processing equipment and that it will meet the low manufacturing-cost objectives. Another significant achievement under this project was the development of a reactive sputtering deposition technology for ZnO. ZnO is used in many solar cell devices, and sputtering is a desirable manufacturing technology. The application of sputtering has been limited because conventional deposition uses ceramic targets that result in low sputtering rates. The use of Zn metal as the target in reactive sputtering overcomes this limitation. The authors have demonstrated that ZnO deposited by reactive sputtering has state-of-the-art opto-electronic properties. These developments result in large-area uniformity and optimized performance and provide a significant opportunity for applying and commercializing the technology. The second objective of this project was to fabricate high-efficiency CdTe solar cells using manufacturing-friendly processes. Three deposition processes were used to deposit CdS films: chemical bath deposition, rf sputtering, and close-spaced sublimation (CSS). The CdTe films were deposited by CSS. A cell with a record efficiency of 15.8% was obtained.

  16. Development of Combinatorial Pulsed Laser Deposition for Expedited Device Optimization in CdTe/CdS Thin-Film Solar Cells

    OpenAIRE

    Ali Kadhim; Paul Harrison; Jake Meeth; Alaa Al-Mebir; Guanggen Zeng; Judy Wu

    2016-01-01

    A combinatorial pulsed laser deposition system was developed by integrating a computer controlled scanning sample stage in order to rapidly screen processing conditions relevant to CdTe/CdS thin-film solar cells. Using this system, the thickness of the CdTe absorber layer is varied across a single sample from 1.5 μm to 0.75 μm. The effects of thickness on CdTe grain morphology, crystal orientation, and cell efficiency were investigated with respect to different postprocessing conditions. It i...

  17. Thin-film CdTe detector for microdosimetric study of radiation dose enhancement at gold-tissue interface.

    Science.gov (United States)

    Paudel, Nava Raj; Shvydka, Diana; Parsai, E Ishmael

    2016-01-01

    Presence of interfaces between high and low atomic number (Z) materials, often encountered in diagnostic imaging and radiation therapy, leads to radiation dose perturbation. It is characterized by a very narrow region of sharp dose enhancement at the interface. A rapid falloff of dose enhancement over a very short distance from the interface makes the experimental dosimetry nontrivial. We use an in-house-built inexpensive thin-film Cadmium Telluride (CdTe) photodetector to study this effect at the gold-tissue interface and verify our experimental results with Monte Carlo (MC) modeling. Three-micron thick thin-film CdTe photodetectors were fabricated in our lab. One-, ten- or one hundred-micron thick gold foils placed in a tissue-equivalent-phantom were irradiated with a clinical Ir-192 high-dose-rate (HDR) source and current measured with a CdTe detector in each case was compared with the current measured for all uniform tissue-equivalent phantom. Percentage signal enhancement (PSE) due to each gold foil was then compared against MC modeled percentage dose enhancement (PDE), obtained from the geometry mimicking the experimental setup. The experimental PSEs due to 1, 10, and 100 μm thick gold foils at the closest measured distance of 12.5μm from the interface were 42.6 ± 10.8 , 137.0 ± 11.9, and 203.0 ± 15.4, respectively. The corresponding MC modeled PDEs were 38.1 ± 1, 164 ± 1, and 249 ± 1, respectively. The experimental and MC modeled values showed a closer agreement at the larger distances from the interface. The dose enhancement in the vicinity of gold-tissue interface was successfully measured using an in-house-built, high-resolution CdTe-based photodetector and validated with MC simulations. A close agreement between experimental and the MC modeled results shows that CdTe detector can be utilized for mapping interface dose distribution encountered in the application of ionizing radiation. PMID:27685139

  18. Technology Support for High-Throughput Processing of Thin-Film CdTe PV Modules Annual Technical Report, Phase II

    Energy Technology Data Exchange (ETDEWEB)

    Rose, D.H.; Powell, R.C.; Karpov, V.; Grecu, D.; Jayamaha, U.; Dorer, G.L. (First Solar, L.L.C.)

    2001-02-05

    Results and conclusions from Phase II of a three-year subcontract are presented. The subcontract, entitled Technology Support for High-Throughput Processing of Thin-Film CdTe PV Modules, is First Solar's portion of the Thin-Film Photovoltaic Partnership Program. The research effort of this subcontract is divided into four areas of effort: (1) process and equipment development, (2) efficiency improvement, (3) characterization and analysis, and (4) environmental, health, and safety. As part of the process and equipment development effort, a new semiconductor deposition system with a throughput of 3 m2/min was completed, and a production line in a new 75,000 ft2 facility was started and is near completion. As part of the efficiency-improvement task, research was done on cells and modules with thin CdS and buffer layers as way to increase photocurrent with no loss in the other photovoltaic characteristics. A number of activities were part of the characterization and analysis task, including developing a new admittance spectroscopy system, with a range of 0.001 Hz to 100 kHz, to characterize cells. As part of the environmental, health, and safety task, the methanol-based CdCl2 process was replaced with aqueous-CdCl2. This change enabled the retention of a De Minimus level of emissions for the manufacturing plant, so no permitting is required.

  19. Band diagrams and performance of CdTe solar cells with a Sb2Te3 back contact buffer layer

    Directory of Open Access Journals (Sweden)

    Songbai Hu

    2011-12-01

    Full Text Available Sb2Te3 thin films were prepared by vacuum co-evaporation and the crystallinity of the films was greatly improved after annealing at 573 K in N2 ambient. Then they were deposited on the CdTe thick films. Band diagrams of the as-deposited and annealed CdTe/Sb2Te3 interfaces were constructed. Consequently, Sb2Te3 was used as a back contact layer for CdTe thin film solar cells and the cell performance was investigated. It was found that the Sb impurities accumulated in the CdTe grain boundaries diffuse deeply in the CdTe layer, and more photogenerated electrons and holes are separated by the segregated SbCd+ donors into the GBs. What is more, the doping concentration in the vicinity of the CdTe/CdS heterojunction increases for the formation of substitutional SbTe- acceptors under the Cd-rich conditions. For the introduction of the p-type Sb2Te3 layers as the back contact to the CdTe thin film solar cells, the performance of CdTe thin film solar cells has been greatly improved and an efficiency of 13.1% (FF=62.3%, Jsc=25.8 mA/cm2, Voc= 815.8 mV obtained.

  20. The effect of heteropolyacids and isopolyacids on the properties of chemically bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Lejmi, N.; Savadogo, O. [Laboratoire d' Electrochimie et de Materiaux Energetiques, Ecole Polytechnique de Montreal, C.P. 6079, succ. Centre-ville, P.O. Box 6079, Qc, H3C 3A7 Montreal (Canada)

    2001-12-01

    The deposition of CdS films on ITO/glass substrates from a chemical bath containing cadmium acetate, ammonia, ammonium acetate and thiourea has been carried out with and without small amounts of heteropolyacids (HPA) (phosphotungstic acid (PTA): H{sub 3}[PW{sub 12}O{sub 40}], silicotungstic acid (STA): H{sub 4}[SiW{sub 12}O{sub 40}], phosphomolybdic acid (PMA): H{sub 3}[PMo{sub 12}O{sub 40}]) and isopolyacids (IPA) (tungstic acid (TA): H{sub 2}WO{sub 4} and molybdic acid (MA): H{sub 2}MoO{sub 4}) for different deposition times. The chemical, morphological, structural and optical properties of the films have been determined. The composition in sulphur and in cadmium of the films' surface and volume was determined for various HPA and IPA used in the deposition bath. The HPA and IPA which give the thickest film with the biggest grain size were deduced. The optical transmission at 400nm of CdS films deposited with STA at short time (20min) (50%) is higher than those of CdS deposited at longer time (6h) (7%). The optical transmission of CdS deposited with STA at short time is higher (50%) than that of CdS deposited without STA (20%). The performances of heterojunctions CdS/CdTe solar cells fabricated from CdS films deposited with and without STA and CdTe films deposited without STA have been determined. It was shown that the CdS/CdTe heterojunction solar cells fabricated from CdS films deposited with STA exhibited better photon collection efficiency and solar cell efficiency ({eta}=6%) than CdS/CdTe heterojunction solar cells fabricated from CdS films deposited without STA ({eta}=3.3%)

  1. Effect of In Situ Thermal Annealing on Structural, Optical, and Electrical Properties of CdS/CdTe Thin Film Solar Cells Fabricated by Pulsed Laser Deposition

    Directory of Open Access Journals (Sweden)

    Alaa Ayad Al-mebir

    2016-01-01

    Full Text Available An in situ thermal annealing process (iTAP has been introduced before the common ex situ cadmium chloride (CdCl2 annealing to improve crystal quality and morphology of the CdTe thin films after pulsed laser deposition of CdS/CdTe heterostructures. A strong correlation between the two annealing processes was observed, leading to a profound effect on the performance of CdS/CdTe thin film solar cells. Atomic force microscopy and Raman spectroscopy show that the iTAP in the optimal processing window produces considerable CdTe grain growth and improves the CdTe crystallinity, which results in significantly improved optoelectronic properties and quantum efficiency of the CdS/CdTe solar cells. A power conversion efficiency of up to 7.0% has been obtained on thin film CdS/CdTe solar cells of absorber thickness as small as 0.75 μm processed with the optimal iTAP at 450°C for 10–20 min. This result illustrates the importance of controlling microstructures of CdTe thin films and iTAP provides a viable approach to achieve such a control.

  2. Size dependent electron transfer from CdTe quantum dots linked to TiO2 thin films in quantum dot sensitized solar cells

    International Nuclear Information System (INIS)

    In this present study, we demonstrate the size dependent charge transfer from CdTe quantum dots (QDs) into TiO2 substrate and relate this charge transfer to the actual behavior of a CdTe sensitized solar cell. CdTe QDs was synthesized using mercaptopropionic acid as the capping agent. The conduction band offset for TiO2 and CdTe QDs indicates thermodynamically favorable band edge positions for smaller QDs for the electron-transfer at the QD–TiO2 interface. Time-resolved emission studies were carried out for CdTe QD on glass and CdTe QD on TiO2 substrates. Results on the quenching of QD luminescence, which relates to the transfer kinetics of electrons from the QD to the TiO2 film, showed that at the smaller QD sizes the transfer kinetics are much more rapid than at the larger sizes. I–V characteristics of quantum dot sensitized solar cells (QDSSC) with different sized QDs were also investigated indicating higher current densities at smaller QD sizes consistent with the charge transfer results. The maximum injection rate constant and photocurrent were obtained for 2.5 nm CdTe QDs. We have been able to construct a solar cell with reasonable characteristics (Voc = 0.8 V, Jsc = 1 mA cm−2, FF = 60%, η = 0.5%). - Highlights: • Size dependant charge transfer from quantum dots to TiO2. • Smaller quantum dot sizes promote higher current densities in solar cell. • Smaller quantum dots have favorable band edge positions and transport kinetics

  3. Raman investigation on thin and thick CdTe films obtained by close spaced vacuum sublimation technique

    International Nuclear Information System (INIS)

    The CdTe thin and thick films were obtained by the close spaced vacuum sublimation technique on a glass substrate under the following growth conditions: the evaporator temperature was 620 C; and the substrate temperature was varied in the range from 250 C to 550 C. High purity CdTe powder was used as a charge for evaporation. The Raman spectra were measured using TRIAX 320 and TRIAX 550 spectrometers at room temperature. The 488-nm line and 514.5-nm line of an Ar+ laser and a 785-nm diode laser were used as excitation sources. The signal was collected by the liquid nitrogen cooled charge-coupled-device (CCD) detector. A number of intense Raman peaks at 140, 167, 190, 271, 332 and 493 cm-1 were observed and were interpreted as TO (140 cm-1), 1LO (167 cm-1), 2LO (332 cm-1), 3LO (493 cm-1) phonon modes and plasmon-phonon mode (190 cm-1). The presence of several phonon replicas in the Raman spectra confirms high crystal quality of the samples. (copyright 2014 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  4. Chemical bath deposition of II-VI compound thin films

    Science.gov (United States)

    Oladeji, Isaiah Olatunde

    II-VI compounds are direct bandgap semiconductors with great potentials in optoelectronic applications. Solar cells, where these materials are in greater demand, require a low cost production technology that will make the final product more affordable. Chemical bath deposition (CBD) a low cost growth technique capable of producing good quality thin film semiconductors over large area and at low temperature then becomes a suitable technology of choice. Heterogeneous reaction in a basic aqueous solution that is responsible for the II-VI compound film growth in CBD requires a metal complex. We have identified the stability constant (k) of the metal complex compatible with CBD growth mechanism to be about 106.9. This value is low enough to ensure that the substrate adsorbed complex relax for subsequent reaction with the chalcogen precursor to take place. It is also high enough to minimize the metal ion concentration in the bath participating in the precipitation of the bulk compounds. Homogeneous reaction that leads to precipitation in the reaction bath takes place because the solubility products of bulk II-VI compounds are very low. This reaction quickly depletes the bath of reactants, limit the film thickness, and degrade the film quality. While ZnS thin films are still hard to grow by CBD because of lack of suitable complexing agent, the homogeneous reaction still limits quality and thickness of both US and ZnS thin films. In this study, the zinc tetraammine complex ([Zn(NH3) 4]2+) with k = 108.9 has been forced to acquire its unsaturated form [Zn(NH3)3]2+ with a moderate k = 106.6 using hydrazine and nitrilotriacetate ion as complementary complexing agents and we have successfully grown ZnS thin films. We have also, minimized or eliminated the homogeneous reaction by using ammonium salt as a buffer and chemical bath with low reactant concentrations. These have allowed us to increase the saturation thickness of ZnS thin film by about 400% and raise that of US film

  5. Deposition of biopolymer films on micromechanical sensors

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Gammelgaard, Lene; Jensen, Marie P.;

    2011-01-01

    The influence of various parameters on the spray-coating of thin films of poly(l-lactide) (PLLA) was investigated. The optimized processing conditions were used for deposition of the biodegradable polymer on arrays of SU-8 microcantilevers. The resonance frequency of the cantilevers before and af...

  6. Source Molecular Effect on Amorphous Carbon Film Deposition

    OpenAIRE

    Kawazoe, Hiroki; Inayoshi, Takanori; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi; Nitta, Yuki; Nakatani, Tatsuyuki

    2009-01-01

    We investigated deposition process of amorphous carbon films using acetylene and methane as a source molecule, by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). We found that deposited film structures were different due to source molecules.

  7. Magnetic properties of LCMO deposited films

    Science.gov (United States)

    Park, Seung-Iel; Jeong, Kwang Ho; Cho, Young Suk; Kim, Chul Sung

    2002-04-01

    La-Ca-Mn-O films were deposited with various thickness (500, 1000 and 1500°C) by RF-magnetron sputtering at 700°C and by the spin coating of sol-gel method at 400°C on LaAlO 3(1 0 0) and Si(1 0 0) single-crystal substrates. The crystal structure and chemical composition of the film grown by RF sputtering method were orthorhombic and La 0.89Ca 0.11MnO 3, respectively, while the film prepared by sol-gel spin coating was cubic with La 0.7Ca 0.3MnO 3. The temperature dependence of the resistance for the film grown by RF sputtering method with the thickness of 1000°C shows that a semiconductor-metal transition occurs at 242 K. The relative maximum magnetoresistance is about 273% at 226 K.

  8. Effect of In Situ Thermal Annealing Process on Structural, Optical and Electrical Properties of CdSCdTe Thin-Film Solar Cells Fabricated by Pulsed Laser Deposition

    Science.gov (United States)

    Al-mebir, Alaa Ayad Khedhair

    Cadmium Telluride has long been recognized as the second lowest- cost material after Si in the world photovoltaic market, specifically for thin-film solar cells. The two attractive properties of the CdTe are its nearly ideal band gap of ˜1.5 eV for single p-n junction photovoltaic and its high optical absorption coefficient up to 105 cm-1. Therefore, a thickness of ˜1 mum of CdTe can absorb up to 90% of the incident light. The key to high-performance thin film CdTe-based solar cells is controlling microstructure of the CdS/CdTe through obtaining high-quality crystalline CdTe thin films that have low density pinholes and other defects and form high-quality p-n heterojunction interfaces on the CdS or other window layers. Considering these, the relative high temperatures used for CdTe thick film growth may not be suitable in the thin film case due to lack of control in CdTe microstructure evolution. Therefore, development of low-temperature processes for CdTe thin film solar cells is important to achieving a precise control of the CdS/CdTe microstructure and optoelectronic properties. In addition, low temperatures provide benefits in wider selection of substrates especially those for low-cost, flexible solar cells applications. However, the CdS/CdTe solar cells based on thin CdTe films fabricated at low temperature have generally poor performance as a result of increased density of grain boundaries and defects. In order to address this issue, we have developed an in situ thermal annealing process (iTAP) immediately after the CdS/CdTe deposition using Pulsed laser deposition (PLD) at 200 °C and before the common ex situ CdCl2 annealing typically employed for optimization of the CdTe-based solar cells. A systematic study on the microstructure, optical and optoelectronic properties of CdS/CdTe solar cells processed under different iTAP conditions has been carried out. It has been found that these physical properties depend sensitively on the iTAP processing conditions

  9. New Sunshine Program for fiscal 2000. Development of photovoltaic system commercialization technology - Development of thin-film solar cell manufacturing technology - Development of low-cost/large area module manufacturing technology (Development of high-reliability CdTe solar cell module manufacturing technology); 2000 nendo New sunshine keikaku seika hokokusho. Taiyoko hatsuden system jitsuyoka gijutsu kaihatsu, Hakumaku taiyodenchi no seizo gijutsu kaihatsu, Tei cost dai menseki mojuru seizo gijutsu kaihatsu (Koshinraisei CdTe taiyo denchi mojuru no seizo gijutsu kaihatsu)

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2001-03-01

    Research and development was conducted for reliable CdTe solar cell modules, large in area and high in efficiency. In the study of large-area CdS thin film fabrication, a conversion efficiency of 12.5-14.2% was achieved in a cell in a large-area substrate using a mist method-aided process of continuous CdS film fabrication. In the study of large-area CdTe thin film fabrication, the optimization was studied of the base-forming CdS film fabrication conditions and of the CdTe film fabrication conditions in a method using a CdTe powder processed by dry kneading, and a conversion efficiency peak was found to exist when the CdS film thickness was in the range of 700-900 angstrom. In the fabrication of large-area submodules, a large-area substrate was taken up, and TCO (transparent conducting oxide) film was fabricated by the mist method, CdTe film by the normal pressure CSS method, electrodes by the screen printing method, and CdTe film patterns by the blast method. As the result, a conversion efficiency of 11.0% was achieved. In a cost estimation for large-area CdTe solar cell modules, 140 yen/Wp (conversion efficiency: 11.0%, annual production: 100 MW) was obtained. (NEDO)

  10. Pulsed laser deposition of pepsin thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kecskemeti, G. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary)]. E-mail: kega@physx.u-szeged.hu; Kresz, N. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary); Smausz, T. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Hopp, B. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Nogradi, A. [Department of Ophthalmology, University of Szeged, H-6720, Szeged, Koranyi fasor 10-11 (Hungary)

    2005-07-15

    Pulsed laser deposition (PLD) of organic and biological thin films has been extensively studied due to its importance in medical applications among others. Our investigations and results on PLD of a digestion catalyzing enzyme, pepsin, are presented. Targets pressed from pepsin powder were ablated with pulses of an ArF excimer laser ({lambda} = 193 nm, FWHM = 30 ns), the applied fluence was varied between 0.24 and 5.1 J/cm{sup 2}. The pressure in the PLD chamber was 2.7 x 10{sup -3} Pa. The thin layers were deposited onto glass and KBr substrates. Our IR spectroscopic measurements proved that the chemical composition of deposited thin films is similar to that of the target material deposited at 0.5 and 1.3 J/cm{sup 2}. The protein digesting capacity of the transferred pepsin was tested by adapting a modified 'protein cube' method. Dissolution of the ovalbumin sections proved that the deposited layers consisted of catalytically active pepsin.

  11. Growth of polycrystalline CdS and CdTe thin layers for high efficiency thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Romeo, N.; Bosio, A.; Tedeschi, R.; Canevari, V. [Parma Univ. (Italy). Dipartimento di Fisica

    2000-10-16

    Recently, conversion efficiencies close to 16% for thin film solar cells based on the CdS/CdTe heterojunction have been reported. These relevant results, however, have not yet solved the problems which arise when industrial production is undertaken as the demand for low cost imposes constraints which considerably limit the final efficiency of the cells. In this paper, we will show that very high conversion efficiencies can still be achieved even making use of low cost soda-lime glass as substrate. In fact, the Na contained in this kind of glass diffuses during the fabrication of the cell into the active layers of the device causing a substantial decrease of the fill factor and consequently of the efficiency of the cell. In particular, we will describe the methods and the magnetron sputtering techniques used to grow a polycrystalline CdS thin film with a controlled Na content. We will also describe the details of the growth via the close-spaced sublimation (CSS) technique of the CdTe polycrystalline film, which are crucial for the heterojunction and the back contact which has been fabricated exploiting the characteristics of Sb{sub 2}Te{sub 3} which is a low gap p-type semiconductor with a high conductivity. (orig.)

  12. Electrodeposited CdTe and HgCdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Basol, B.M.

    1988-01-15

    The processing steps necessary for producing high efficiency electrodeposited CdTe and HgCdTe solar cells are described. The key step in obtaining solar cell grade p-type CdTe and HgCdTe is the 'type conversion-junction formation' (TCJF) process. The TCJF process involves the heat treatment of the as-deposited n-type CdTe and HgCdTe layers at around 400 /sup 0/C. This procedure converts these n-type films into high resistivity p type and forms a rectifying junction between them and the underlying n-type window layers. Possible effects of oxygen on the TCJF process are discussed. The results of studies made on the structural, electrical and optical properties of the electrodeposited CdS, CdTe and HgCdTe films are presented. The resistivity of the electrodeposited HgCdTe can be made lower than that of CdTe. Consequently, solar cells made using the HgCdTe films have, on the average, better fill factors than those made using the CdTe layers, HgCdTe is also attractive for tandem-cell applications because of its variable band gap which can be easily tuned to the desired value. CdS/CdTe and CdS/HgCdTe heterojunction solar cells with 10.3% and 10.6% efficiency have been demonstrated using electrodeposition techniques and the TCJF process.

  13. Grain boundaries in CdTe thin film solar cells: a review

    Science.gov (United States)

    Major, Jonathan D.

    2016-09-01

    The current state of knowledge on the impact of grain boundaries in CdTe solar cells is reviewed with emphasis being placed on working cell structures. The role of the chemical composition of grain boundaries as well as growth processes are discussed, along with characterisation techniques such as electron beam induced current and cathodoluminescence, which are capable of extracting information on a level of resolution comparable to the size of the grain boundaries. Work which attempts to relate grain boundaries to device efficiency is also assessed and gaps in the current knowledge are highlighted.

  14. Electrical Properties Analysis of Copper doped CdTe/CdS Deposited Thin Films on ITO Coated Glass Substrates

    Science.gov (United States)

    Lesinski, Darren; Flaherty, James; Sahiner, M. Alper

    CdTe proves to be a viable source for renewable energy in the form of photovoltaic conversion. While CdTe/CdS naturally provide interesting results adding dopants to the cell can yield higher conversion efficiencies. Copper, famous for its electrical properties, can be used as a dopant in the CdTe layer. In conjunction with its dopant characteristics Copper also improves cell performance by acting as a low resistant and high current back contact. All thin films were synthesized using pulsed laser deposition onto ITO coated glass substrates. The CdS layer across all cells has an approximate thickness of 1500 Angstroms. The following CdTe layer has an approximate thickness of 5500 Angstroms. This created the base cell that was then doped. Cu, typically deposited using sublimation or vapor deposition, was done by PLD as well. Two of the three base cells were treated with Cu using the same deposition parameters. The third cell also received a CdCl treatment on top of the Cu layer to understand the effect when the oxygen layer is deferred. Ellipsometer measurements were used to confirm layer thickness. XRD analysis was used to confirm the presence of Cu and the crystal structure of the thin films. A Hall Effect Measurement system was used to measure active charge carrier concentration introduced by dopant. Also, a Keithley sourcemeter was utilized to determine photovoltaic properties. Notable results discussed will be the effects of Copper dopant on the electrical properties of CdS/CdTe based solar cells.

  15. Oxygen Incorporation During Fabrication of Substrate CdTe Photovoltaic Devices: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Duenow, J. N.; Dhere, R. G.; Kuciauskas, D.; Li, J. V.; Pankow, J. W.; DeHart, C. M.; Gessert, T. A.

    2012-06-01

    Recently, CdTe photovoltaic (PV) devices fabricated in the nonstandard substrate configuration have attracted increasing interest because of their potential compatibility with flexible substrates such as metal foils and polymer films. This compatibility could lead to the suitability of CdTe for roll-to-roll processing and building-integrated PV. Currently, however, the efficiencies of substrate CdTe devices reported in the literature are significantly lower ({approx}6%-8%) than those of high-performance superstrate devices ({approx}17%) because of significantly lower open-circuit voltage (Voc) and fill factor (FF). In our recent device development efforts, we have found that processing parameters required to fabricate high-efficiency substrate CdTe PV devices differ from those necessary for traditional superstrate CdTe devices. Here, we investigate how oxygen incorporation in the CdTe deposition, CdCl2 heat treatment, CdS deposition, and post-deposition heat treatment affect device characteristics through their effects on the junction. By adjusting whether oxygen is incorporated during these processing steps, we have achieved Voc values greater than 860 mV and efficiencies greater than 10%.

  16. Optical characterization of epitaxial single crystal CdTe thin films on Al{sub 2}O{sub 3} (0001) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Jovanovic, S.M.; Devenyi, G.A., E-mail: devenyga@mcmaster.ca; Jarvis, V.M.; Meinander, K.; Haapamaki, C.M.; Kuyanov, P.; Gerber, M.; LaPierre, R.R.; Preston, J.S.

    2014-11-03

    The optoelectronic properties of single crystal CdTe thin films were investigated by photoluminescence spectroscopy, photoreflectance spectroscopy and variable angle spectroscopic ellipsometry. The room temperature bandgap was measured to be 1.51 eV and was consistent between spectroscopic measurements and previously reported values. Breadth of bandgap emission was consistent with high quality material. Low temperature photoluminescence spectra indicated a dominant emission consistent with bound excitons. Emissions corresponding to self-compensation defects, doping and contaminants were not found. Variable angle spectroscopic ellipsometry measurements over the near-UV to infrared range demonstrated sharp resonance peaks. All spectroscopic measurements indicate high quality thin film material of comparable or better quality than bulk CdTe. - Highlights: • High quality epitaxial CdTe thin films were grown. • Two dimensional X-ray diffraction characterization confirmed single crystal material. • Photoluminescence indicated low defect density when compared to bulk single crystals. • Optical characterization indicated the presence of room temperature excitons.

  17. Growth of CdTe on Si(100) surface by ionized cluster beam technique: Experimental and molecular dynamics simulation

    Science.gov (United States)

    Araghi, Houshang; Zabihi, Zabiholah; Nayebi, Payman; Ehsani, Mohammad Mahdi

    2016-10-01

    II-VI semiconductor CdTe was grown on the Si(100) substrate surface by the ionized cluster beam (ICB) technique. In the ICB method, when vapors of solid materials such as CdTe were ejected through a nozzle of a heated crucible into a vacuum region, nanoclusters were created by an adiabatic expansion phenomenon. The clusters thus obtained were partially ionized by electron bombardment and then accelerated onto the silicon substrate at 473 K by high potentials. The cluster size was determined using a retarding field energy analyzer. The results of X-ray diffraction measurements indicate the cubic zinc blende (ZB) crystalline structure of the CdTe thin film on the silicon substrate. The CdTe thin film prepared by the ICB method had high crystalline quality. The microscopic processes involved in the ICB deposition technique, such as impact and coalescence processes, have been studied in detail by molecular dynamics (MD) simulation.

  18. Fabrication of stable, large-area thin-film CdTe photovoltaic modules

    Science.gov (United States)

    Zhou, T. X.

    1995-06-01

    During the period of this subcontract, May 1991 through February 1995, Solar Cells, Inc. has developed and demonstrated a low-cost process to fabricate stable large-area cadmium telluride based thin-film photovoltaic modules. This report summarizes the final phase of the project which is concentrated on process optimization and product life tests. One of the major post-deposition process steps, the CdCl2 heat treatment, has been experimentally replaced with alternative treatments with vapor chloride or chlorine gas. Material and device qualities associated with alternative treatments are comparable or superior to those with the conventional treatment. Extensive experiments have been conducted to optimize the back-electrode structure in order to ensure long term device stability. Numerous small-area cells and minimodules have been subjected to a variety of stress tests, including but not limited to continuous light soak under open or short circuit or with resistive load, for over 10,000 hours. Satisfactory stability has been demonstrated on 48 and 64 sq cm minimodules under accelerated tests and on 7200 sq cm large modules under normal operating conditions. The conversion efficiency has also been significantly improved during this period. The total area efficiency of 7200 sq cm module has reached 8.4%, corresponding to a 60.3 W normalized output; the efficiency of 64 sq cm minimodules and 1.1 sq cm cells has reached 10.5% (aperture area) and 12.4% (total area), respectively.

  19. Preparation of p-type NiO films by reactive sputtering and their application to CdTe solar cells

    Science.gov (United States)

    Ishikawa, Ryousuke; Furuya, Yasuaki; Araki, Ryouichi; Nomoto, Takahiro; Ogawa, Yohei; Hosono, Aikyo; Okamoto, Tamotsu; Tsuboi, Nozomu

    2016-02-01

    Transparent p-type NiO films were prepared by reactive sputtering using the facing-target system under Ar-diluted O2 gas at Tsub of 30 and 200 °C. The increasing intensity of dominant X-ray diffraction (XRD) peaks indicates improvements in the crystallinity of NiO films upon Cu doping. In spite of the crystallographic and optical changes after Cu-doping, the electrical properties of Cu-doped NiO films were slightly improved. Upon Ag-doping at 30 °C under low O2 concentration, on the other hand, the intensity of the dominant (111) XRD peaks was suppressed and p-type conductivity increased from ˜10-3 to ˜10-1 S cm-1. Finally, our Ag-doped NiO films were applied as the back contact of CdTe solar cells. CdTe solar cells with a glass/ITO/CdS/CdTe/NiO structure exhibited an efficiency of 6.4%, suggesting the high potential of using p-type NiO for the back-contact film in thin-film solar cells.

  20. Resonant infrared pulsed laser deposition of thin biodegradable polymer films

    DEFF Research Database (Denmark)

    Bubb, D.M.; Toftmann, B.; Haglund Jr., R.F.;

    2002-01-01

    Thin films of the biodegradable polymer poly(DL-lactide-co-glycolide) (PLGA) were deposited using resonant infrared pulsed laser deposition (RIR-PLD). The output of a free-electron laser was focused onto a solid target of the polymer, and the films were deposited using 2.90 (resonant with O...

  1. Ion-assisted doping of CdTe

    Energy Technology Data Exchange (ETDEWEB)

    Fahrenbruch, A.L.; Chien, K.F.; Kim, D.; Lopez-Otero, A.; Sharps, P.; Bube, R.H. (Dept. of Materials Science and Engineering, Stanford Univ., CA (USA))

    1989-10-15

    The possibility of using ion-assisted doping during growth of p-CdTe films for solar cells has been investigated, to obtain higher doping densities than previously obtained with conventional film deposition processes. For the first time, controlled doping has been demonstrated with low-energy phosphorus ions to obtain hole densities of up to 2 x 10{sup 17} cm{sup -3} in homoepitaxial films deposited by vacuum evaporation on single-crystal CdTe. Solar cells made with these films suggest that ion damage reduces the diffusion length in the most highly doped films and that the active region of such cells must be made with considerably lower doping densities. For polycrystalline films on alumina, preliminary results indicate that the hole densities obtained are not sufficient to overcome grain boundary barrier limited conductivity. (orig.).

  2. Electrophoretically-deposited solid film lubricants

    Energy Technology Data Exchange (ETDEWEB)

    Dugger, M.T.; Panitz, J.K.J.; Vanecek, C.W.

    1995-04-01

    An aqueous-based process that uses electrophoresis to attract powdered lubricant in suspension to a charged target was developed. The deposition process yields coatings with low friction, complies with environmental safety regulations, requires minimal equipment, and has several advantages over processes involving organic binders or vacuum techniques. This work focuses on development of the deposition process, includes an analysis of the friction coefficient of the material in sliding contact with stainless steel under a range of conditions, and a functional evaluation of coating performance in a precision mechanical device application. Results show that solid lubricant films with friction coefficients as low as 0.03 can be produced. A 0.03 friction coefficient is superior to solid lubricants with binder systems and is comparable to friction coefficients generated with more costly vacuum techniques.

  3. 具有复合背接触层的 CdTe多晶薄膜太阳电池%Polycrystalline CdTe thin- film solar cells with complex back contact layers

    Institute of Scientific and Technical Information of China (English)

    覃文治; 夏庚培; 郑家贵; 李卫; 蔡伟; 冯良桓; 蔡亚平; 黎兵; 张静全; 武莉莉

    2005-01-01

    To improve the properties of back contacts of CdTe solar cells, ZnTe:Cu and polycrystalline Cd1- xZnxTe films were deposited by simultaneous evaporation. Investigative data of the configuration and performance indicate that energy gap of Cd1- xZnxTe films assume quadratic connection with zinc content. With increasing of Cu content, energy gap of polycrystalline ZnTe:Cu will decrease. ZnTe/ZnTe:Cu or Cd1- xZnxTe/ZnTe:Cu back contacted cells can reduce the heterogeneous interface state density and modify the structure of energy band of the solar cells. Furthermore, diffusion of Cu can avoid by this compound films in CdTe solar cells. An efficiency of 13.38% of solar cell with dimension of 0.502cm2was fabricated.%为了提高 CdTe太阳电池的背接触性能,用共蒸发法制备了 ZnTe:Cu和 Cd1- xZnxTe多晶薄膜. 研究结果表明: Cd1- xZnxTe多晶薄膜的能隙与锌含量呈二次方关系, ZnTe:Cu多晶薄膜能隙随着掺 Cu浓度的增加而减小.分别用 ZnTe/ZnTe:Cu和 Cd1- xZnxTe/ZnTe:Cu复合膜作为背接触层,既能 修饰异质结界面,改善电池的能带结构,又能防止 Cu原子向电池内部扩散.因此获得了面积 0.502cm2,转换效率为 13.38%的 CdTe多晶薄膜太阳电池.

  4. Liquid-phase-deposited barium titanate thin films on silicon

    International Nuclear Information System (INIS)

    Using a mixture of hexafluorotitanic acid, barium nitrate and boric acid, high refractive index (1.54) barium titanate films can be deposited on silicon substrates. The deposited barium titanate films have featureless surfaces. The deposition temperature is near room temperature (800C). However, there are many fluorine and silicon incorporations in the films. The refractive index of the as-deposited film is 1.54. By current-voltage measurement, the leakage current of the as-deposited film with a thickness of 1000 A is about 9.48x10-7 A cm-2 at the electrical field intensity of 0.3 MV cm-1. By capacitance-voltage measurement, the effective oxide charge of the liquid-phase-deposited barium titanate film is 3.06x1011 cm-2 and the static dielectric constant is about 22. (author)

  5. Effect of in situ UHV CdCl2-activation on the electronic properties of CdTe thin film solar cells

    International Nuclear Information System (INIS)

    To reach reasonable conversion efficiencies of approximately 10% and above with CdTe thin film solar cells an activation step involving chlorine at elevated temperatures seems to be necessary before back contact formation. This activation process has been simulated in an ultrahigh-vacuum (UHV) system. Solar cells with a maximum efficiency of 9.1% have been prepared using this process. In addition the effect of the CdCl2 activation process on the electronic properties of each solar cell layer, SnO2, CdS and CdTe has been investigated in situ using photoelectron spectroscopy. The effects of the activation on the Fermi level position of all investigated layers is presented and discussed

  6. Cadmium sulfide thin films deposited by close spaced sublimation and cadmium sulfide/cadmium telluride solar cells

    Science.gov (United States)

    Marinskiy, Dmitriy Nikolaevich

    1998-12-01

    One of the applications of CdS films is as a window layer in CdTe and Cu(In,Ga)Sesb2 solar cells. The study of the optical and structural properties of CdS films deposited by close spaced sublimation as well as their influence on CdS/CdTe solar cell performance is part of the CdTe solar cell program at the University of South Florida. CdS films have been deposited by the close-spaced sublimation technique. The influence of the main process parameters, the substrate and source temperatures, and the ambient in the deposition chamber has been investigated. As-deposited films have been subjected to heat treatments in Hsb2 ambient, in CdClsb2 atmosphere, and in atmosphere with small amounts of oxygen. A special annealing chamber was built to carry out the annealing experiments in the presence of CdClsb2 vapor and oxygen. Several CSS chambers were assembled to study the influence of various process parameters simultaneously and validate the results. Results of scanning electron microscopy and photoluminescence measurements have been used as the primary characterization techniques. X-ray diffraction, electron microprobe analysis, and transmission measurements have also been carried out. It was found that as deposited CdS films have a hexagonal structure independent of the process parameters used. The presence of a CdO phase was detected in the samples grown with the highest oxygen concentration in the ambient. The resistivity of CdS films is controlled by intergrain barriers. Photoluminescence measurements showed the presence of oxygen-acceptor transition and a wide variation in the intensity of deep emission bands. The variation in the intensities was correlated with the variation in the deposition and annealing conditions. However, no correlation was found between the PL intensities of defect bands and cell performance. CdS/CdTe junctions have been fabricated using standard deposition and postgrowth techniques developed in the USF solar cells laboratory. All cells have

  7. Chemical Liquid Phase Deposition of Thin Aluminum Oxide Films

    OpenAIRE

    Sun, Jie; Sun, Yingchun

    2007-01-01

    Thin aluminum oxide films were deposited by a new and simple physicochemical method called chemical liquid phase deposition (CLD) on semiconductor materials. Aluminum sulfate with crystallized water and sodium bicarbonate were used as precursors for film growth, and the control of the system pH value played an important role in this experiment. The growth rate is 12 nm/h at room temperature. Post-growth annealing not only densifies and purifies the films, but results in film crystallization a...

  8. Energetic Deposition of Niobium Thin Film in Vacuum

    OpenAIRE

    Wu, Genfa

    2002-01-01

    Niobium thin films are expected to be free of solid inclusions commonly seen in solid niobium. For particle accelerators, niobium thin film has the potential to replace the solid niobium in the making of the accelerating structures. In order to understand and improve the superconducting performance of niobium thin films at cryogenic temperature, an energetic vacuum deposition system has been developed to study deposition energy effects on the properties of niobium thin films on various substr...

  9. Effect of In Situ Thermal Annealing on Structural, Optical, and Electrical Properties of CdS/CdTe Thin Film Solar Cells Fabricated by Pulsed Laser Deposition

    OpenAIRE

    Alaa Ayad Al-mebir; Paul Harrison; Ali Kadhim; Guanggen Zeng; Judy Wu

    2016-01-01

    An in situ thermal annealing process (iTAP) has been introduced before the common ex situ cadmium chloride (CdCl2) annealing to improve crystal quality and morphology of the CdTe thin films after pulsed laser deposition of CdS/CdTe heterostructures. A strong correlation between the two annealing processes was observed, leading to a profound effect on the performance of CdS/CdTe thin film solar cells. Atomic force microscopy and Raman spectroscopy show that the iTAP in the optimal processing w...

  10. Growth, surface treatment and characterization of polycrystalline lead iodide thick films prepared using close space deposition technique

    Science.gov (United States)

    Zhu, Xinghua; Sun, Hui; Yang, Dingyu; Zheng, Xiaolin

    2012-11-01

    Lead iodide (PbI2) polycrystalline thick films were fabricated on glass substrates with a conductive indium-tin-oxide layer using a close space deposition technique. The morphology of the as-deposited PbI2 films is typically and highly oriented polycrystalline structure, made up of microcrystal platelets upright on the substrate plane. Two techniques including the surface mechanical cutting and after-growth cadmium telluride coating were employed to improve the films' surface properties. It was shown that both of the film surface treatment methods markedly decreased the dark current of PbI2 films. The photo-to-dark current ratio of about 2.05 under 241Am γ-ray source with activity of 2.78 μCi irradiation was obtained from the film treated using both surface cutting and after-growth CdTe coating. Charge transport characteristics of these films were measured and the hole mobility 7.7×10-2-1.67×10-1 cm2/V s was estimated.

  11. Depth profiling sulphur in bulk CdTe and {CdTe}/{CdS} thin film heterojunctions

    Science.gov (United States)

    Lane, D. W.; Conibeer, G. J.; Romani, S.; Healy, M. J. F.; Rogers, K. D.

    1998-03-01

    Polycrystalline CdTeCdS heterojunction solar cells are a possible candidate for the low cost, high efficiency conversion of solar energy. The formation of an intermediate CdS xTe 1- x layer during a high temperature annealing stage is believed to increase optical absorption and decrease cell efficiency. S diffusion in single crystal CdTe has been investigated by NRA using the 32S (d,p o) 33S nuclear reaction, at a deuteron energy of 2 MeV. Details of the NRA depth profiling procedure are given, which was found to be relatively straightforward and suitable for use on a small Van de Graaff accelerator. The resulting diffusion parameters are compared to those obtained by SIMS using a Cs + primary ion beam, examining negative secondary ions. The diffusion coefficients were found to be 1.1 × 10 -15cm 2 s -1 at 450°C and ˜8 × 10 -15cm -1 s at 550°C. S diffusion in thin films was also investigated by 2 MeV 4He + RBS on annealed polycrystalline CdSCdTe multilayers.

  12. Application of closed field magnetron sputtering deposition in thin film photovoltaics

    Science.gov (United States)

    Gibson, D. R.; Waugh, A. R.; Upadhyaya, Hari M.; Nasikkar, P. S.; Walls, J. M.

    2009-08-01

    Thin film solar cell technology is highly promising to enable clean and low cost generation of solar electricity for various applications. The high efficiency, flexibility and lightweight advantages of thin film solar cells, together with stable performance and potentially low production costs, further enhance their attractiveness for both terrestrial and space applications. A distinct manufacturing advantage of thin film solar cells is the use of fast vacuum deposition methods, providing the high throughput essential to reduce manufacturing costs. However, an essential pre-requisite is the development of deposition techniques which combine capability to deposit the solar cell thin film multilayer preferably within a single vacuum cycle, removing the requirement for certain process steps to be carried out using non-vacuum wet chemistry. Moreover, process development is also needed to provide low temperature processing and low stress multilayer thin film structures which enable photovoltaic devices to be deposited on to low cost flexible polymer or metal substrates. In this paper a new sputtering tool strategy is introduced, utilising high plasma densities (~10mA.cm-2) and low ion energies, thereby lowering process temperature and film stress for deposition onto both flexible and solid substrates. The technique uses magnetrons of opposing magnetic polarity to create a "closed field" in which the plasma density is enhanced without the need for high applied voltages. A prototype batch system has been designed which employs a rotating vertical drum as the substrate carrier and a symmetrical array of four linear magnetrons. The magnetrons are fitted with target materials for each of the thin films required in the PV stack including the CdTe absorber layer, CdS buffer layer and the back TCO contact. Details of the system design will be provided together with optical, electrical and metrology data already obtained from ITO thin films. The "closed field" sputtering

  13. Pulsed laser deposition and characterization of Alnico5 magnetic films

    International Nuclear Information System (INIS)

    Alnico5 films were deposited by pulsed laser deposition on glass substrate at room temperature under a vacuum ∼10−3 Torr in the absence and in the presence of 500 Oe external transverse magnetic field applied on the plasma plume during film deposition. For this purpose, Nd:YAG laser was employed to ablate the Alnico5 target. The ablated material was deposited on glass substrate placed at a distance of 2 cm from the target. The structural and magnetic properties of the film were analyzed by X-ray diffraction, atomic force microscope, and vibrating sample magnetometer. X-ray diffraction patterns showed that the Alnico5 films were amorphous in nature. Atomic force microscopy revealed that the Alnico5 film deposited in absence of external magnetic field has larger root-mean-square roughness value (60.2 nm) than the magnetically deposited film (42.9 nm). Vibrating sample magnetometer measurements showed that the in-plane saturation magnetization of Alnico5 film deposited in the presence of external magnetic field increases by 32% as compared to that for the film deposited in the absence of external magnetic field. However, the out-of-plane saturation magnetization was almost independent of the external magnetic field. In magnetically deposited film, there is in-plane anisotropy parallel to the applied external magnetic field.

  14. Real-Time Deposition Monitor for Ultrathin Conductive Films

    Science.gov (United States)

    Hines, Jacqueline

    2011-01-01

    A device has been developed that can be used for the real-time monitoring of ultrathin (2 or more) conductive films. The device responds in less than two microseconds, and can be used to monitor film depositions up to about 60 thick. Actual thickness monitoring capability will vary based on properties of the film being deposited. This is a single-use device, which, due to the very low device cost, can be disposable. Conventional quartz/crystal microbalance devices have proven inadequate to monitor the thickness of Pd films during deposition of ultrathin films for hydrogen sensor devices. When the deposited film is less than 100 , the QCM measurements are inadequate to allow monitoring of the ultrathin films being developed. Thus, an improved, high-sensitivity, real-time deposition monitor was needed to continue Pd film deposition development. The new deposition monitor utilizes a surface acoustic wave (SAW) device in a differential delay-line configuration to produce both a reference response and a response for the portion of the device on which the film is being deposited. Both responses are monitored simultaneously during deposition. The reference response remains unchanged, while the attenuation of the sensing path (where the film is being deposited) varies as the film thickness increases. This device utilizes the fact that on high-coupling piezoelectric substrates, the attenuation of an SAW undergoes a transition from low to very high, and back to low as the conductivity of a film on the device surface goes from nonconductive to highly conductive. Thus, the sensing path response starts with a low insertion loss, and as a conductive film is deposited, the film conductivity increases, causing the device insertion loss to increase dramatically (by up to 80 dB or more), and then with continued film thickness increases (and the corresponding conductivity increases), the device insertion loss goes back down to the low level at which it started. This provides a

  15. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  16. The mechanical properties of thin alumina film deposited by metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Gellings, P.J.; Vendel, van de D.; Metselaar, H.S.C.; Corbach, van H.D.; Fransen, T.

    1995-01-01

    Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low and atmospheric pressures. The effects of deposition temperature, growth rate and film thickness on the mechanical pro

  17. Manufacturing of CSS CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Bonnet, D. [ANTEC Solar GmbH, Rudisleben (Germany)

    2000-02-21

    Due to its basic physical and chemical properties CdTe has become a favoured base material for thin film solar cells, using robust, high-throughput manufacturing procedures. The technology shows significant potential for attaining cost levels of <0.5 Euro/W{sub p}. Close-spaced sublimation (CSS) is the fastest and simplest deposition process for both semiconductors used, CdTe and CdS, permitting in-line production at a high linear speed of about 1 m/min. The individual manufacturing steps for integrated modules are explained in view of their incorporation into the production line. ANTEC solar GmbH is engaged to enter the production of CdTe thin film modules on a scale of 10 MW{sub p} (100000 m{sup 2}) per annum, using CSS as the deposition procedure for the semiconductor films, and high-rate in-line sputtering for transparent and opaque contacts. Standard module size will be 60 x 120 cm{sup 2}. The production line is presently under construction. (orig.)

  18. Photoluminescence study of Cu diffusion in CdTe

    Energy Technology Data Exchange (ETDEWEB)

    Grecu, D.; Compaan, A.D. [Department of Physics, University of Toledo, Toledo, Ohio (United States)

    1999-03-01

    We report changes in the photoluminescence spectra associated with the diffusion of Cu in CdTe thin films used in CdTe/CdS solar cells. Films grown by vapor transport deposition and radio-frequency sputtering as well as single crystal CdTe were included in the study. The main effects of Cu diffusion appear to be the quenching of a donor-acceptor transition associated with Cd vacancies and the increase in intensity of a lower energy broad-band transition. The PL is subsequently used to explore the effects of electric fields on Cu diffusion. The role of Te as a diffusion barrier for Cu is investigated. {copyright} {ital 1999 American Institute of Physics.}

  19. Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henley, W.B.; Sacks, G.J. [Univ. of South Florida, Tampa, FL (United States). Center of Microelectronics

    1997-03-01

    Use of plasma-enhanced chemical vapor deposition (PECVD) for electrochromic WO{sub 3} film deposition is investigated. Oxygen, hydrogen, and tungsten hexafluoride were used as source gases. Reactant gas flow was investigated to determine the effect on film characteristics. High quality optical films were obtained at deposition rates on the order of 100 {angstrom}/s. Higher deposition rates were attainable but film quality and optical coherence degraded. Atomic emission spectroscopy (AES), was used to provide an in situ assessment of the plasma deposition chemistry. Through AES, it is shown that the hydrogen gas flow is essential to the deposition of the WO{sub 3} film. Oxygen gas flow and tungsten hexafluoride gas flow must be approximately equal for high quality films.

  20. Direct observation of electrical properties of grain boundaries in sputter-deposited CdTe using scan-probe microwave reflectivity based capacitance measurements

    Science.gov (United States)

    Tuteja, Mohit; Koirala, Prakash; MacLaren, Scott; Collins, Robert; Rockett, Angus

    2015-10-01

    Polycrystalline CdTe in 12% efficient solar cells has been studied using scanning microwave impedance microscopy (sMIM). The CdS/CdTe junctions were grown on transparent-conducting-oxide-coated soda lime glass using rf sputter deposition. sMIM based capacitance measurements were performed on the exposed surface of CdCl2 treated CdTe adjacent to thermal-evaporation-deposited Cu/Au back contacts. The sMIM instrument was operated at ˜3 GHz, and capacitance measurements were performed as a function of ac and dc voltage biases applied to the tip, with and without sample illumination. Although dc capacitance measurements are affected by sample topography, the differential capacitance measurement was shown to be topography independent. It was found that the grain boundaries exhibit a depleted carrier concentration as compared to the grain bulk. This depletion effect is enhanced under photo-generated carrier separation or under sufficiently large probe tip biases opposite to the majority carrier charge.

  1. Local Structure and Electrical Performance of Pulsed Laser Deposited CdTe/CdS Thin-Film Solar Cells

    Science.gov (United States)

    Nabizadeh, Arya; Lesinski, Darren; Cerqueira, Luis; Sahiner, Mehmet; Sahiner-Amscl Team

    2015-03-01

    The photovoltaic thin films of CdS/CdTe were prepared by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass. The local structural variations in the thin films around Cd atom upon variations in the thin film growth parameters were investigated by X-ray absorption near-edge spectroscopy (XANES) and extended X-ray absorption fine-structure spectroscopy (EXAFS) and x-ray diffraction. X-ray absorption spectroscopy measurements were performed at the National Synchrotron Light Source of Brookhaven National Laboratory. The effect of the thicknesses of the CdS and CdTe layers, laser energy and the substrate temperature on the local crystal structure and coordination around the Cd atoms were investigated through quantitative multiple scattering analysis and modeling of the x-ray absorption spectroscopy data. The induced local structural modifications upon varying synthesis conditions are correlated with the electrical performance of these photovoltaic thin-films. The quantitative multiple scattering analyses and modeling of X-ray absorption spectroscopy data revealed the local environment around the Cd atoms are highly sensitive to thin film deposition parameters and the variations of the Cd local structure influences interface quality consequently, affect the electrical performance of these photovoltaic thin films. This work is supported by NSF Award #:DMI-0420952 and Research Corporation Award #:CC6405 and New Jersey Space Grant Consortium.

  2. Correlations of Capacitance-Voltage Hysteresis with Thin-Film CdTe Solar Cell Performance During Accelerated Lifetime Testing

    Energy Technology Data Exchange (ETDEWEB)

    Albin, D.; del Cueto, J.

    2011-03-01

    In this paper we present the correlation of CdTe solar cell performance with capacitance-voltage hysteresis, defined presently as the difference in capacitance measured at zero-volt bias when collecting such data with different pre-measurement bias conditions. These correlations were obtained on CdTe cells stressed under conditions of 1-sun illumination, open-circuit bias, and an acceleration temperature of approximately 100 degrees C.

  3. ZnO thin films prepared by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tsoutsouva, M.G. [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Panagopoulos, C.N., E-mail: chpanag@metal.ntua.gr [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Papadimitriou, D. [National Technical University of Athens, Department of Physics, GR-15780 Athens (Greece); Fasaki, I.; Kompitsas, M. [Theor. and Phys./Chem. Institute, National Hellenic Research Foundation, 48 Vas. Konstantinou Ave., 11635 Athens (Greece)

    2011-04-15

    Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by pulsed laser deposition (PLD) in an oxygen-reactive atmosphere. The structural, optical, and electrical properties of the as-prepared thin films were studied in dependence of substrate temperature and oxygen pressure. High quality polycrystalline ZnO films with hexagonal wurtzite structure were deposited at substrate temperatures of 100 and 300 deg. C. The RMS roughness of the deposited oxide films was found to be in the range 2-9 nm and was only slightly dependent on substrate temperature and oxygen pressure. Electrical measurements indicated a decrease of film resistivity with the increase of substrate temperature and the decrease of oxygen pressure. The ZnO films exhibited high transmittance of 90% and their energy band gap and thickness were in the range 3.26-3.30 eV and 256-627 nm, respectively.

  4. Characterization of Cu1.4Te Thin Films for CdTe Solar Cells

    Directory of Open Access Journals (Sweden)

    Guangcan Luo

    2014-01-01

    Full Text Available The copper telluride thin films were prepared by a coevaporation technique. The single-phase Cu1.4Te thin films could be obtained after annealing, and annealing temperature higher than 220°C could induce the presence of cuprous telluride coexisting phase. Cu1.4Te thin films also demonstrate the high carrier concentration and high reflectance for potential photovoltaic applications from the UV-visible-IR transmittance and reflectance spectra, and Hall measurements. With contacts such as Cu1.4Te and Cu1.4Te/CuTe, cell efficiencies comparable to those with conventional back contacts have been achieved. Temperature cycle tests show that the Cu1.4Te contact buffer has also improved cell stability.

  5. Analysis of the diode characteristics of thin film solar cells based on CdTe

    International Nuclear Information System (INIS)

    A physical approach to the optimization of photoelectric processes in thin film multilayer systems has been developed. By means of a simulation of the influence of light-diode characteristics on the efficiency factor, it is concluded that the optimization of the photoelectric processes in ITO/CdS/CdTe/Cu/Au film solar cells is mainly determined by two competing physical mechanisms: an increase in the efficiency of the process of distribution of nonequilibrium charge carriers and a reduction in the efficiency of their generation, as the CdS layer thickness grows

  6. Properties of electrophoretically deposited single wall carbon nanotube films

    Energy Technology Data Exchange (ETDEWEB)

    Lim, Junyoung; Jalali, Maryam; Campbell, Stephen A., E-mail: campb001@umn.edu

    2015-08-31

    This paper describes techniques for rapidly producing a carbon nanotube thin film by electrophoretic deposition at room temperature and determines the film mass density and electrical/mechanical properties of such films. The mechanism of electrophoretic deposition of thin layers is explained with experimental data. Also, film thickness is measured as a function of time, electrical field and suspension concentration. We use Rutherford backscattering spectroscopy to determine the film mass density. Films created in this manner have a resistivity of 2.14 × 10{sup −3} Ω·cm, a mass density that varies with thickness from 0.12 to 0.54 g/cm{sup 3}, and a Young's modulus between 4.72 and 5.67 GPa. The latter was found to be independent of thickness from 77 to 134 nm. We also report on fabricating free-standing films by removing the metal seed layer under the CNT film, and selectively etching a sacrificial layer. This method could be extended to flexible photovoltaic devices or high frequency RF MEMS devices. - Highlights: • We explain the electrophoretic deposition process and mechanism of thin SWCNT film deposition. • Characterization of the SWCNT film properties including density, resistivity, transmittance, and Young's modulus. • The film density and resistivity are found to be a function of the film thickness. • Techniques developed to create free standing layers of SW-CNTs for flexible electronics and mechanical actuators.

  7. Plasma-deposited a-C(N) H films

    CERN Document Server

    Franceschini, D E

    2000-01-01

    The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.

  8. Precursors for the polymer-assisted deposition of films

    Science.gov (United States)

    McCleskey, Thomas M.; Burrell, Anthony K.; Jia, Quanxi; Lin, Yuan

    2013-09-10

    A polymer assisted deposition process for deposition of metal oxide films is presented. The process includes solutions of one or more metal precursor and soluble polymers having binding properties for the one or more metal precursor. After a coating operation, the resultant coating is heated at high temperatures to yield metal oxide films. Such films can be epitaxial in structure and can be of optical quality. The process can be organic solvent-free.

  9. Influence of deposition time on the properties of chemical bath deposited manganese sulfide thin films

    Directory of Open Access Journals (Sweden)

    Anuar Kassim

    2010-12-01

    Full Text Available Manganese sulfide thin films were chemically deposited from an aqueous solution containing manganese sulfate, sodium thiosulfate and sodium tartrate. The influence of deposition time (2, 3, 6 and 8 days on the properties of thin films was investigated. The structure and surface morphology of the thin films were studied by X-ray diffraction and atomic force microscopy, respectively. In addition, in order to investigate the optical properties of the thin films, the UV-visible spectrophotometry was used. The XRD results indicated that the deposited MnS2 thin films exhibited a polycrystalline cubic structure. The number of MnS2 peaks on the XRD patterns initially increased from three to six peaks and then decreased to five peaks, as the deposition time was increased from 2 to 8 days. From the AFM measurements, the film thickness and surface roughness were found to be dependent on the deposition time.

  10. Varying cadmium telluride growth temperature during deposition to increase solar cell reliability

    Energy Technology Data Exchange (ETDEWEB)

    Albin, David S.; Johnson, James Neil; Zhao, Yu; Korevaar, Bastiaan Arie

    2016-04-26

    A method for forming thin films or layers of cadmium telluride (CdTe) for use in photovoltaic modules or solar cells. The method includes varying the substrate temperature during the growth of the CdTe layer by preheating a substrate (e.g., a substrate with a cadmium sulfide (CdS) heterojunction or layer) suspended over a CdTe source to remove moisture to a relatively low preheat temperature. Then, the method includes directly heating only the CdTe source, which in turn indirectly heats the substrate upon which the CdTe is deposited. The method improves the resulting CdTe solar cell reliability. The resulting microstructure exhibits a distinct grain size distribution such that the initial region is composed of smaller grains than the bulk region portion of the deposited CdTe. Resulting devices exhibit a behavior suggesting a more n-like CdTe material near the CdS heterojunction than devices grown with substrate temperatures held constant during CdTe deposition.

  11. Characterization of transparent silica films deposited on polymeric materials

    International Nuclear Information System (INIS)

    Silica films were synthesized by capacitively coupled RF PECVD using mixtures of organo-silane and oxygen as a source. The chemical bonding states and compositions of the films deposited were evaluated with FTIR and XPS. Film surfaces and cross-sections were observed by SEM. Oxygen transmission rates (OTR) of the films coated on polyethylene terephthalate (PET) substrates were measured by an isopiestic method. (Authors)

  12. Synthesis of tungsten oxide thin film by liquid phase deposition

    International Nuclear Information System (INIS)

    High purity and well crystallized tungsten acid hydrates (H2WO4.H2O) thin films were prepared from H2WO4-HF(aq.) and H3BO3 as precursors by the liquid phase deposition method. The crystal structure was indexed as monoclinic with unit cell lattice constants a = 7.517 A, b = 6.907 A, c = 3.694 A and β = 89.58 deg. The monoclinic phase was transformed into orthorhombic WO3.H2O after heating at 100 deg. C. Further heating from 300 to 500 deg. C resulted in an anhydrous monoclinic WO3 films. The effects of the composition and the reaction time on the deposition and the microstructures of the deposited films were studied by the means of scanning electron microscope (SEM), transmission electron microscope (TEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The film formation showed strong dependence upon the composition, whereas the amount of deposition, the shape and the films thickness could be controlled by the reaction time. Cross-sectional TEM image of WO3 film deposited on Au wire indicated that the epitaxial growth of the film was maintained after calcination at 500 deg. C. XPS analysis also revealed the existence of W6+ ions in both the deposited and calcined films.

  13. Controlled cadmium telluride thin films for solar cell applications (emerging materials systems for solar cell applications). Quarterly progress report No. 1, April 9-July 8, 1979

    Energy Technology Data Exchange (ETDEWEB)

    Vedam, K.

    1979-08-01

    Preparation and properties of cadmium telluride thin films for use in solar cells are studied. CdTe sputter deposition, crystal doping, and carrier typing are discussed. Future experimental plans are described. (WHK)

  14. Crystalline Indium Sulphide thin film by photo accelerated deposition technique

    Science.gov (United States)

    Dhanya, A. C.; Preetha, K. C.; Deepa, K.; Remadevi, T. L.

    2015-02-01

    Indium sulfide thin films deserve special attention because of its potential application as buffer layers in CIGS based solar cells. Highly transparent indium sulfide (InS) thin films were prepared using a novel method called photo accelerated chemical deposition (PCD). Ultraviolet source of 150 W was used to irradiate the solution. Compared to all other chemical methods, PCD scores its advantage for its low cost, flexible substrate and capable of large area of deposition. Reports on deposition of high quality InS thin films at room temperature are very rare in literature. The precursor solution was initially heated to 90°C for ten minutes and then deposition was carried out at room temperature for two hours. The appearance of the film changed from lemon yellow to bright yellow as the deposition time increased. The sample was characterized for its structural and optical properties. XRD profile showed the polycrystalline behavior of the film with mixed phases having crystallite size of 17 nm. The surface morphology of the films exhibited uniformly distributed honey comb like structures. The film appeared to be smooth and the value of extinction coefficient was negligible. Optical measurements showed that the film has more than 80% transmission in the visible region. The direct band gap energy was 2.47eV. This method is highly suitable for the synthesis of crystalline and transparent indium sulfide thin films and can be used for various photo voltaic applications.

  15. Experimental evaluation of a-Se and CdTe flat-panel x-ray detectors for digital radiography and fluoroscopy

    Science.gov (United States)

    Adachi, Susumu; Hori, Naoyuki; Sato, Kenji; Tokuda, Satoshi; Sato, Toshiyuki; Uehara, Kazuhiro; Izumi, Yoshihiro; Nagata, Hisashi; Yoshimura, Youji; Yamada, Satoshi

    2000-04-01

    Described are two types of direct-detection flat-panel X-ray detectors utilizing amorphous selenium (a-Se) and cadmium telluride (CdTe). The a-Se detector is fabricated using direct deposition onto a thin film transistor (TFT) substrate, whereas the CdTe detector is fabricated using a novel hybrid method, in which CdTe is pre-deposited onto a glass substrate and then connected to a TFT substrate. The detector array format is 512 X 512 with a pixel pitch of 150 micrometer. The imaging properties of both detectors have been evaluated with respect to X-ray sensitivity, lag, spatial resolution, and detective quantum efficiency (DQE). The modulation transfer functions (MTFs) measured at 1 lp/mm were 0.96 for a- Se and 0.65 for CdTe. The imaging lags after 33 ms were about 4% for a-Se and 22% for CdTe. The DQE values measured at zero spatial frequency were 0.75 for a-Se and 0.22 for CdTe. The results indicate that the a-Se and CdTe detectors have high potential as new digital X-ray imaging devices for both radiography and fluoroscopy.

  16. Long carrier lifetimes in large-grain polycrystalline CdTe without CdCl2

    Science.gov (United States)

    Jensen, S. A.; Burst, J. M.; Duenow, J. N.; Guthrey, H. L.; Moseley, J.; Moutinho, H. R.; Johnston, S. W.; Kanevce, A.; Al-Jassim, M. M.; Metzger, W. K.

    2016-06-01

    For decades, polycrystalline CdTe thin films for solar applications have been restricted to grain sizes of microns or less whereas other semiconductors such as silicon and perovskites have produced devices with grains ranging from less than a micron to more than 1 mm. Because the lifetimes in as-deposited polycrystalline CdTe films are typically limited to less than a few hundred picoseconds, a CdCl2 treatment is generally used to improve the lifetime; but this treatment may limit the achievable hole density by compensation. Here, we establish methods to produce CdTe films with grain sizes ranging from hundreds of nanometers to several hundred microns by close-spaced sublimation at industrial manufacturing growth rates. Two-photon excitation photoluminescence spectroscopy shows a positive correlation of lifetime with grain size. Large-grain, as-deposited CdTe exhibits lifetimes exceeding 10 ns without Cl, S, O, or Cu. This uncompensated material allows dopants such as P to achieve a hole density of 1016 cm-3, which is an order of magnitude higher than standard CdCl2-treated devices, without compromising the lifetime.

  17. Long Carrier Lifetimes in Large-Grain Polycrystalline CdTe Without CdCl2

    Energy Technology Data Exchange (ETDEWEB)

    Jensen, Soren A.; Burst, James M.; Duenow, Joel N.; Guthrey, Harvey L.; Moseley, John; Moutinho, Helio R.; Johnston, Steve W.; Kanevce, Ana; Al-Jassim, Mowafak M.; Metzger, Wyatt K.

    2016-06-27

    For decades, polycrystalline CdTe thin films for solar applications have been restricted to grain sizes of microns or less whereas other semiconductors such as silicon and perovskites have produced devices with grains ranging from less than a micron to more than 1 mm. Because the lifetimes in as-deposited polycrystalline CdTe films are typically limited to less than a few hundred picoseconds, a CdCl2 treatment is generally used to improve the lifetime; but this treatment may limit the achievable hole density by compensation. Here, we establish methods to produce CdTe films with grain sizes ranging from hundreds of nanometers to several hundred microns by close-spaced sublimation at industrial manufacturing growth rates. Two-photon excitation photoluminescence spectroscopy shows a positive correlation of lifetime with grain size. Large-grain, as-deposited CdTe exhibits lifetimes exceeding 10 ns without Cl, S, O, or Cu. This uncompensated material allows dopants such as P to achieve a hole density of 1016 cm-3, which is an order of magnitude higher than standard CdCl2-treated devices, without compromising the lifetime.

  18. High efficiency CSS CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ferekides, C.S.; Marinskiy, D.; Viswanathan, V.; Tetali, B.; Palekis, V.; Selvaraj, P.; Morel, D.L. [University of South Florida, Tampa, FL (United States). Dept. of Electrical Engineering

    2000-02-21

    Cadmium telluride (CdTe) has long been recognized as a strong candidate for thin film solar cell applications. It has a bandgap of 1.45 eV, which is nearly ideal for photovoltaic energy conversion. Due to its high optical absorption coefficient essentially all incident radiation with energy above its band-gap is absorbed within 1-2 {mu}m from the surface. Thin film CdTe solar cells are typically heterojunctions, with cadmium sulfide (CdS) being the n-type junction partner. Small area efficiencies have reached the 16.0% level and considerable efforts are underway to commercialize this technology. This paper will present work carried out at the University South Florida sponsored by the National Renewable Energy Laboratory of the United States Department of Energy, on CdTe/CdS solar cells fabricated using the close spaced sublimation (CSS) process. The CSS technology has attractive features for large area applications such as high deposition rates and efficient material utilization. The structural and optical properties of CSS CdTe and CdS films and junctions will be presented and the influence of some important CSS process parameters will be discussed. (orig.)

  19. Effect of deposition pressure and post deposition annealing on SmCo thin film properties

    International Nuclear Information System (INIS)

    In this article we report on the effect of the deposition pressure and the post deposition annealing conditions on the structural and magnetic properties of SmCo thin films deposited on Si(100) wafers employing Ta buffer and capping layers. The films were deposited by DC magnetron sputtering and annealed in vacuum at various temperatures. The films under investigation were isotropic with high remanence magnetization, maximum coercive field of 8 kOe and a squareness ratio of coercivity higher than 0.9. It was found that the Ar pressure during the deposition is a key factor in controlling the stoichiometry and the structural and magnetic properties of the SmCo films, while the effect of the annealing temperature is crucial in optimizing the magnetic properties of the films. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  20. Iridium thin films deposited via pulsed laser deposition for future applications as transition-edge sensors

    Energy Technology Data Exchange (ETDEWEB)

    Galeazzi, M. E-mail: galeazzi@physics.miami.edu; Chen, C.; Cohn, J.L.; Gundersen, J.O

    2004-03-11

    The University of Miami has recently started developing and studying high-resolution microcalorimeters operating near 100 mK for X-ray and particle physics and astrophysics. These detectors will be based on Transition Edge Sensors technology fabricated using iridium thin films deposited via the Pulsed Laser Deposition technique. We report here the preliminary result of the room temperature characterization of the Ir thin films, and an overview of future plans to use the films as transition edge sensors.

  1. Deposition of metal oxide films and nanostructures by methods derived from photochemical metal organic deposition

    OpenAIRE

    Xin ZHANG

    2009-01-01

    In this research, methods for the deposition of patterned films and nanostructures were developed from photochemical metal organic deposition (PMOD). Positive lithographic PMOD was demonstrated with films of titanium (IV) di-n-butoxide bis(2-ethylhexanoate) (Ti(OBun)2(eh)2), titanium (IV) diisopropoxide bis(2,4-pentanedionate), and zirconium (IV) di-n-butoxide bis(2,4-pentanedionate). The photochemistry of these complexes in films was studied by FTIR, AES, and XRD. Photo-induced reactivity an...

  2. As-grown magnesium diboride superconducting thin films deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Grassano, G.; Ramadan, W.; Ferrando, V.; Bellingeri, E.; Marre, D.; Ferdeghini, C.; Grasso, G.; Putti, M.; Chincarini, A. [INFM, Dipartimento di Fisica, Genoa (Italy); Manfrinetti, P.; Palenzona, A. [INFM, Dipartimento di Chimica e Chimica Industriale, Genoa (Italy)

    2001-09-01

    As-grown superconducting MgB{sub 2} thin films were deposited by pulsed laser deposition on magnesium oxide and sapphire substrates. Starting from a non-stoichiometric, Mg and B mixed-powder target, we were able to grow the superconducting phase during the film deposition, without any further annealing process. So far, samples grown in the temperature range of 400-450 deg. C, and at an argon buffer pressure of the order of 10{sup -2} mbar turned out to be superconducting with an onset temperature of the resistive transition at about 25 K. Even if the deposition process still needs to be fully optimized, we have demonstrated that this method allows us to achieve in situ deposition of as-grown superconducting thin films. This procedure could therefore be promising for the deposition of high-quality epitaxial MgB{sub 2} thin films. (author)

  3. Coloration efficiency of chemically deposited electrochromic thin films

    International Nuclear Information System (INIS)

    Transparent nickel oxide and copper oxide thin films were produced by very simple and economic method of chemical deposition. Those films were deposited onto fluorine doped tin oxide (FTO) coated glass substrates. Electrochromic test device (ECTD) was constructed by using these films as working electrodes, together with the FTO as a counter electrode in alkaline environment (0,1 M NaOH aqueous solution). All the obtained films exhibited electrochromic behavior. Nichel oxide films were transparent for visible light in the reduced state, and displayed a dark brown color in the oxidised state and displayed a very dark brown color in the reduced state. The coloration efficiency (CE) at wavelength λ=670 nm was estimated from the slope of the graphical presentation of the optical density as a function of the charge density, during the charge extraction (nickel oxide films) and charge insertion (copper oxide films). (Author)

  4. 利用碳糊成膜法改进CdTe太阳电池背处理工艺%Back contact process of CdTe solar cell using the carbon-paste film forming

    Institute of Scientific and Technical Information of China (English)

    罗翀; 李娟; 李翔; 姚素英; 熊绍珍

    2011-01-01

    提出一种新型的制备Cd%太阳电池背接触方法。利用碳糊成膜法,将含Cu、Te的CdCl2浆状悬浊液涂覆在CdTe表面,只进行一次后退火,X射线衍射(XRD)、二次质子谱(SIMS)测试发现,就能同时达到CdCl2后处理的作用、形成CuxTe的缓冲层和降低背接触势垒的目的。实验结果表明。本文方法将传统的CdCl2后处理和形成CujWe缓冲层工艺合二为一,制备的CdTe太阳电池含较好控制了的Cu扩散,提高了电池性能;且制备工艺简单易行,可以较显著地降低成本,适合大面积生产。%A new method to prepare CdTe solar cell based on the carbon-paste film forming is introduced in this article. According to the analysis by XRD and SIMS spectrum,it was indicated that this technology integrates deposition of the back contact and CdC12 treatment into one process, which can not only form CuxTe layer but also activate with CdC12 simultaneously. In addition,it can control the diffusion of Cu,which could increase the efficiency. This simple method has the possible application in CdTe solar cell industry.

  5. Plasma sputtering system for deposition of thin film combinatorial libraries

    Science.gov (United States)

    Cooper, James S.; Zhang, Guanghai; McGinn, Paul J.

    2005-06-01

    The design of a plasma sputtering system for the deposition of combinatorial libraries is described. A rotating carousel is used to position shadow masks between the targets and the substrate. Multilayer films are built up by depositing sequentially through various masks. Postdeposition annealing is used to promote interdiffusion of the layered structures. Either discrete or compositional gradient libraries can be deposited in this system. Samples appropriate for characterization with a scanning electrochemical microscope or a multichannel microelectrode array system can be produced. The properties of some deposited Pt-Ru films for fuel cell applications are described.

  6. The effects of CdS processing and glass substrates on the performance of CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ferekides, C.S.; Dugan, K.; Ceekala, V.; Killian, J.; Oman, D.; Swaminathan, R.; Morel, D.L. [Univ. of South Florida, Tampa, FL (United States). Dept. of Electrical Engineering

    1994-12-31

    Cadmium Sulfide films prepared by rf sputtering and close spaced sublimation (CSS) have been used for the fabrication of CdTe/CdS thin film solar cells on borosilicate glass substrates. The CdTe layer was prepared by CSS at high processing temperatures (600 C). CdS films prepared by the chemical bath deposition process (CBD) were deposited on tin oxide coated soda lime glass substrates. For these devices the CSS CdTe films were prepared at low substrate temperatures (< 550 C). Devices prepared at low processing temperatures (CdTe-CSS/CdS-CBD) on soda lime glass substrates exhibited efficiencies in excess of 13% as measured under AM 1.5 conditions at the National Renewable Energy Laboratory.

  7. Sputter deposition of BSCCO films from a hollow cathode

    International Nuclear Information System (INIS)

    High-Tc superconducting thin films were deposited onto MgO single crystal substrates from a hollow cathode onto ceramic targets with the nominal composition of Bi2Sr2CaCu2Ox. Films similar in composition to those used for the targets were deposited on MgO substrates by rf sputtering. The effects of sputtering time, rf power, and post-annealing on film microstructure and properties were studied in detail. Substrate temperature was found to have a significant influence on the film characteristics. Initial results show that deposition rates from a hollow cathode are an order of magnitude higher than those of a planar magnetron source at equivalent power levels. Large deposition rates allow for the coating of long lengths of wire

  8. Magnetron deposition of TCO films using ion beam

    Science.gov (United States)

    Asainov, O.; Umnov, S.; Chinin, A.

    2015-11-01

    Thin films of tin oxide (TO) were deposited on the glass substrates at room temperature using reactive magnetron sputtering at various oxygen partial pressures. After the deposition the films were irradiated with argon ions beam. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties in the range of 300-1100 nm were investigated by photometry as well as their structural properties were studied using X-ray diffraction. Diffractometric research showed that the films, deposited on a substrate, have a crystal structure, and after argon ions irradiation they become quasi-crystalline (amorphous). It was found that the transmission increases proportionally with the irradiation time, but the surface resistance -disproportionally.

  9. Chemical Liquid Phase Deposition of Thin Aluminum Oxide Films

    Institute of Scientific and Technical Information of China (English)

    SUN,Jie(孙捷); SUN,Ying-Chun(孙迎春)

    2004-01-01

    Thin aluminum oxide films were deposited by a new and simple physicochemical method called chemical liquid phase deposition (CLD) on semiconductor materials. Aluminum sulfate with crystallized water and sodium bicarbonate were used as precursors for film growth, and the control of the system's pH value played an important role in this experiment. The growth rate is 12 nm/h with the deposition at [Al2(SO4)3]=0.0837 mol·L-1, [NaHCO3]=0.214 mol·L-1, 15 ℃. Post-growth annealing not only densifies and purifies the films, but results in film crystallization as well, Excellent quality of A12O3 films in this work is supported by electron dispersion spectroscopy,Fourier transform infrared spectrum, X-ray diffraction spectrum and scanning electron microscopy photograph.

  10. Nanocomposite oxide thin films grown by pulsed energy beam deposition

    Energy Technology Data Exchange (ETDEWEB)

    Nistor, M., E-mail: mnistor@infim.ro [National Institute for Lasers, Plasma and Radiation Physics, L22, P.O. Box MG-36, 77125 Bucharest-Magurele (Romania); Petitmangin, A.; Hebert, C. [INSP, Universite Pierre et Marie Curie - Paris 6, Campus Boucicaut, 140 rue de Lourmel, 75015 Paris (France); Seiler, W. [LIM, ENSAM, 151 boulevard de l' Hopital, 75013 Paris (France)

    2011-04-01

    Highly non-stoichiometric indium tin oxide (ITO) thin films were grown by pulsed energy beam deposition (pulsed laser deposition-PLD and pulsed electron beam deposition-PED) under low oxygen pressure. The analysis of the structure and electrical transport properties showed that ITO films with a large oxygen deficiency (more than 20%) are nanocomposite films with metallic (In, Sn) clusters embedded in a stoichiometric and crystalline oxide matrix. The presence of the metallic clusters induces specific transport properties, i.e. a metallic conductivity via percolation with a superconducting transition at low temperature (about 6 K) and the melting and freezing of the In-Sn clusters in the room temperature to 450 K range evidenced by large changes in resistivity and a hysteresis cycle. By controlling the oxygen deficiency and temperature during the growth, the transport and optical properties of the nanocomposite oxide films could be tuned from metallic-like to insulating and from transparent to absorbing films.

  11. Nitrogen incorporation in sputter deposited molybdenum nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Stöber, Laura, E-mail: laura.stoeber@tuwien.ac.at; Patocka, Florian, E-mail: florian.patocka@tuwien.ac.at; Schneider, Michael, E-mail: michael.schneider@tuwien.ac.at; Schmid, Ulrich, E-mail: ulrich.e366.schmid@tuwien.ac.at [Institute of Sensor and Actuator Systems, TU Wien, Gußhausstraße 27-29, A-1040 Vienna (Austria); Konrath, Jens Peter, E-mail: jenspeter.konrath@infineon.com; Haberl, Verena, E-mail: verena.haberl@infineon.com [Infineon Technologies Austria AG, Siemensstraße 2, 9500 Villach (Austria)

    2016-03-15

    In this paper, the authors report on the high temperature performance of sputter deposited molybdenum (Mo) and molybdenum nitride (Mo{sub 2}N) thin films. Various argon and nitrogen gas compositions are applied for thin film synthetization, and the amount of nitrogen incorporation is determined by Auger measurements. Furthermore, effusion measurements identifying the binding conditions of the nitrogen in the thin film are performed up to 1000 °C. These results are in excellent agreement with film stress and scanning electron microscope analyses, both indicating stable film properties up to annealing temperatures of 500 °C.

  12. Understanding misfit strain releasing mechanisms via molecular dynamics simulations of CdTe growth on {112}zinc-blende CdS

    Science.gov (United States)

    Zhou, X. W.; Chavez, J. J.; Almeida, S.; Zubia, D.

    2016-07-01

    Molecular dynamics simulations have been used to analyse microstructures of CdTe films grown on {112} surfaces of zinc-blende CdS. Interestingly, CdTe films grow in ⟨331⟩ orientations as opposed to ⟨112⟩ epitaxial orientations. At the CdTe-{331}/CdS-{112} interface, however, there exists an axis that is parallel to the ⟨110⟩ orientation of both CdS and CdTe. It is the direction orthogonal to this ⟨110⟩ that becomes different, being ⟨116⟩ for CdTe and ⟨111⟩ for CdS, respectively. Missing CdTe-{110} planes are found along the ⟨110⟩ axis, suggesting that the misfit strain is released by the conventional misfit dislocation mechanism along this axis. In the orthogonal axis, the misfit strain is found to be more effectively released by the new grain orientation mechanism. Our finding is supported by literature experimental observations of the change of growth direction when Cd0.96Zn0.04Te films are deposited on GaAs. Analyses of energetics clearly demonstrate the cause for the formation of the new orientation, and the insights gained from our studies can help understand the grain structures experimentally observed in lattice mismatched systems.

  13. Manipulation of inter-particle interactions between TiO2 and CdTe: an effective method to enhance the performance of quantum dot sensitized solar cells

    International Nuclear Information System (INIS)

    We have reported a pH-controlled deposition method to directly assemble aqueous 1-thioglycerol and 3-mercaptopropionic acid capped CdTe quantum dots (QDs) on mesoporous TiO2 thin films. The inter-particle interactions between CdTe QDs and mesoporous TiO2 could be modulated with the adjustment of solution pH values. Low amount of QD loading on the mesoporous TiO2 film was observed in the case of electrostatic attraction or strong electrostatic repulsion between CdTe QDs and TiO2. Only at weak electrostatic repulsion between CdTe QDs and TiO2 were high loading and uniform distribution of CdTe QDs obtained on the TiO2 film. Under an optimal condition, a power conversion efficiency of 0.76% was achieved for the CdTe QD sensitized solar cells under the standard illumination condition of simulated AM 1.5G (100 mW cm−2). (paper)

  14. Plasma deposition of polymer composite films incorporating nanocellulose whiskers

    OpenAIRE

    Samyn, P; Airoudj, A.; Laborie, M.-P.; Mathew, A. P.; Roucoules, V.

    2011-01-01

    Abstract In a trend for sustainable engineering and functionalization of surfaces, we explore the possibilities of gas phase processes to deposit nanocomposite films. From an analysis of pulsed plasma polymerization of maleic anhydride in the presence of nanocellulose whiskers, it seems that thin nanocomposite films can be deposited with various patterns. By specifically modifying plasma parameters such as total power, duty cycle, and monomer gas pressure, the nanocellulose whisker...

  15. Band offsets for mismatched interfaces: The special case of ZnO on CdTe (001)

    International Nuclear Information System (INIS)

    High-quality planar interfaces between ZnO and CdTe would be useful in optoelectronic applications. Although CdTe is zinc blende with cubic lattice constant a = 6.482 Å while ZnO is hexagonal wurtzite with a = 3.253 Å and c = 5.213 Å, (001)-oriented cubic zinc blende ZnO films could be stabilized epitaxially on a CdTe (001) surface in an √2 × √2 R45° configuration with a lattice mismatch of <0.5%. Modeling such a configuration allows density-functional total-energy electronic-structure calculations to be performed on several interface arrangements (varying terminations and in-plane fractional translations) to identify the most likely form of the interface, and to predict valence-band offsets between CdTe and ZnO in each case. Growth of ZnO on Te-terminated CdTe(001) is predicted to produce small or even negative (CdTe below ZnO) valence band offsets, resulting in a Type I band alignment. Growth on Cd-terminated CdTe is predicted to produce large positive offsets for a Type II alignment as needed, for example, in solar cells. To corroborate some of these predictions, thin layers of ZnO were deposited on CdTe(001) by pulsed laser deposition, and the band alignments of the resulting heterojunctions were determined from x-ray photoelectron spectroscopy measurements. Although zinc blende ZnO could not be confirmed, the measured valence band offset (2.0–2.2 eV) matched well with the predicted value

  16. ZnS thin film deposited with chemical bath deposition process directed by different stirring speeds

    International Nuclear Information System (INIS)

    In this combined film thickness, scanning electron microscopy (SEM), X-ray diffraction and optical properties study, we explore the effects of different stirring speeds on the growth and optical properties of ZnS film deposited by CBD method. From the disclosed changes of thickness of ZnS film, we conclude that film thickness is independent of the stirring speeds in the heterogeneous process (deposition time less than 40 min), but increases with the stirring speeds and/or deposition time increasing in the homogeneous process. Grazing incident X-ray diffraction (GIXRD) and the study of optical properties disclosed that the ZnS films grown with different stirring speeds show partially crystallized film and exhibit good transmittance (70-88% in the visible region), but the stirring speeds cannot give much effects on the structure and optical properties in the homogeneous process.

  17. Hardness and stress of amorphous carbon film deposited by glow discharge and ion beam assisting deposition

    CERN Document Server

    Marques, F C

    2000-01-01

    The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp sup 2 -rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp sup 3 sites. Furthermore, the same results also indicate that the sp sup 2 sites may also contribute to the hardness of the films.

  18. Electrochromism of the electroless deposited cuprous oxide films

    International Nuclear Information System (INIS)

    Thin cuprous oxide films were prepared by a low cost, chemical deposition (electroless) method onto glass substrates pre-coated with fluorine doped tin oxide. The X-ray diffraction pattern confirmed the Cu2O composition of the films. Visible transmittance spectra of the cuprous oxide films were studied for the as-prepared, colored and bleached films. The cyclic voltammetry study showed that those films exhibited cathode coloring electrochromism, i.e. the films showed change of color from yellowish to black upon application of an electric field. The transmittance across the films for laser light of 670 nm was found to change due to the voltage change for about 50%. The coloration memory of those films was also studied during 6 h, ex-situ. The coloration efficiency at 670 nm was calculated to be 37 cm2/C

  19. Electrochromism of the electroless deposited cuprous oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Neskovska, R. [Faculty of Technical Sciences, University ' St. Clement Ohridski' , Bitola (Macedonia, The Former Yugoslav Republic of); Ristova, M. [Faculty of Natural Sciences and Mathematics, Institute of Physics, P.O. Box 162, Skopje (Macedonia, The Former Yugoslav Republic of)]. E-mail: mristova@iunona.pmf.ukim.edu.mk; Velevska, J. [Faculty of Natural Sciences and Mathematics, Institute of Physics, P.O. Box 162, Skopje (Macedonia, The Former Yugoslav Republic of); Ristov, M. [Macedonian Academy of Sciences and Arts, Skopje, Bul. Krste Misirkov bb, Skopje (Macedonia, The Former Yugoslav Republic of)

    2007-04-09

    Thin cuprous oxide films were prepared by a low cost, chemical deposition (electroless) method onto glass substrates pre-coated with fluorine doped tin oxide. The X-ray diffraction pattern confirmed the Cu{sub 2}O composition of the films. Visible transmittance spectra of the cuprous oxide films were studied for the as-prepared, colored and bleached films. The cyclic voltammetry study showed that those films exhibited cathode coloring electrochromism, i.e. the films showed change of color from yellowish to black upon application of an electric field. The transmittance across the films for laser light of 670 nm was found to change due to the voltage change for about 50%. The coloration memory of those films was also studied during 6 h, ex-situ. The coloration efficiency at 670 nm was calculated to be 37 cm{sup 2}/C.

  20. Characterization of polymer thin films obtained by pulsed laser deposition

    International Nuclear Information System (INIS)

    The development of laser techniques for the deposition of polymer and biomaterial thin films on solid surfaces in a controlled manner has attracted great attention during the last few years. Here we report the deposition of thin polymer films, namely Polyepichlorhydrin by pulsed laser deposition. Polyepichlorhydrin polymer was deposited on flat substrate (i.e. silicon) using an NdYAG laser (266 nm, 5 ns pulse duration and 10 Hz repetition rate). The obtained thin films have been characterized by atomic force microscopy, scanning electron microscopy, Fourier transform infrared spectroscopy and spectroscopic ellipsometry. It was found that for laser fluences up to 1.5 J/cm2 the chemical structure of the deposited polyepichlorhydrin polymer thin layers resembles to the native polymer, whilst by increasing the laser fluence above 1.5 J/cm2 the polyepichlorohydrin films present deviations from the bulk polymer. Morphological investigations (atomic force microscopy and scanning electron microscopy) reveal continuous polyepichlorhydrin thin films for a relatively narrow range of fluences (1-1.5 J/cm2). The wavelength dependence of the refractive index and extinction coefficient was determined by ellipsometry studies which lead to new insights about the material. The obtained results indicate that pulsed laser deposition method is potentially useful for the fabrication of polymer thin films to be used in applications including electronics, microsensor or bioengineering industries.

  1. Photoluminescence properties of poly (p-phenylene vinylene) films deposited by chemical vapor deposition

    International Nuclear Information System (INIS)

    Photoluminescence spectra of PPV at varying thicknesses and temperatures have been studied. A study of the quenching of the polymer film using a modified version of fluorescence spectroscopy reveals interface effects dominating at thicknesses below about 600 Å, while bulk effects dominate at higher thicknesses. The application of the Stern–Volmer equation to solid film is discussed. Stern–Volmer plots were nonlinear with downward deviations at higher thickness of the film which was explained due to self-quenching in films and larger conformational change and increased restriction from change in electron density due to electron transition during excitation in bulk polymer films over 60 nm thick. PPV deposited into porous (∼4 nm in diameter) nanostructured substrate shows a larger 0–0 than 0–1 transition peak intensity and decreased disorder in the films due to structure imposed by substrate matrix. Temperature dependent effects are measured for a film at 500 Å, right on the border between the two areas. PPV films deposited on porous methyl silsesquioxane (MSQ) were also examined in order to compare the flat film to a substrate that allows for the domination of interface effects. The enthalpies of the first two peaks are very similar, but the third peak demonstrates a lower enthalpy and a larger wavelength shift with temperature. Films deposited inside pores show a smaller amount of disorder than flat films. Calculation of the Huang–Rhys factor at varying temperatures for the flat film and film in porous MSQ shows large temperature dependence for the flat film but a smaller amount of disorder in the nanostructured film. -- Highlights: • Poly (p-phenylene vinylene) films deposited by chemical vapor deposition exhibited photoluminescence properties. • Fluorescence spectra of the polymer films revealed interface effects dominating at thicknesses below about 600 Å, while bulk effects dominate at higher thicknesses. • Stern–Volmer plots were

  2. Pulsed laser deposition and characterisation of thin superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Morone, A. [CNR, zona industriale di Tito Scalo, Potenza (Italy). Istituto per i Materiali Speciali

    1996-09-01

    Same concepts on pulsed laser deposition of thin films will be discussed and same examples of high transition temperature (HTc) BiSrCaCuO (BISCO) and low transition temperature NbN/MgO/NbN multilayers will be presented. X-ray and others characterizations of these films will be reported and discussed. Electrical properties of superconducting thin films will be realized as a function of structural and morphological aspect.

  3. Landfill waste and recycling: Use of a screening-level risk assessment tool for end-of-life cadmium telluride (CdTe) thin-film photovoltaic (PV) panels

    International Nuclear Information System (INIS)

    Grid-connected solar photovoltaic (PV) power is currently one of the fastest growing power-generation technologies in the world. While PV technologies provide the environmental benefit of zero emissions during use, the use of heavy metals in thin-film PV cells raises important health and environmental concerns regarding the end-of-life disposal of PV panels. To date, there is no published quantitative assessment of the potential human health risk due to cadmium leaching from cadmium telluride (CdTe) PV panels disposed in a landfill. Thus, we used a screening-level risk assessment tool to estimate possible human health risk associated with disposal of CdTe panels into landfills. In addition, we conducted a literature review of potential cadmium release from the recycling process in order to contrast the potential health risks from PV panel disposal in landfills to those from PV panel recycling. Based on the results of our literature review, a meaningful risk comparison cannot be performed at this time. Based on the human health risk estimates generated for PV panel disposal, our assessment indicated that landfill disposal of CdTe panels does not pose a human health hazard at current production volumes, although our results pointed to the importance of CdTe PV panel end-of-life management. - Highlights: • Analysis of possible human health risk posed by disposal of CdTe panels into landfills. • Qualitative comparison of risks associated with landfill disposal and recycling of CdTe panels. • Landfill disposal of CdTe panels does not pose a human health hazard at current production volumes. • There could be potential risks associated with recycling if not properly managed. • Factors other than concerns over toxic substances will likely drive the decisions of how to manage end-of-life PV panels

  4. CdS薄膜的制备及其在CdTe电池中的应用%Preparation of CdS films and their application in CdTe solar cells

    Institute of Scientific and Technical Information of China (English)

    韩俊峰; 廖成; 江涛; 赵夔

    2011-01-01

    The CdTe solar cell is one of the most popular thin film PV devices, and CdS is used as a suitable window layer for CdTe-based photovoltaic systems. The CdS films here were prepared by chemical bath depostion (CBD) and closed space sublimation (CSS). The complete CdTe/CdS solar cell devices were fabricated and analyzed. It was found that the films prepared by the CSS method have larger grains and better optical/electrical properties. The photoelectric conversion efficiency of such a solar cell comes up to 10.9%. The films deposited by CSS method is fast in vacuum system and suitable for commercial applications.%CdTe薄膜电池是发展最快、应用前景最好的一类太阳能电池.CdS层是CdTe电池的窗口层材.料,其薄膜质量直接影响电池的转换效率.本文介绍了化学水浴沉积(CBD)和闭空间升华(CSS)两种方法沉积CdS薄膜,并完成单电池器件的制备和测试.CSS方法制备的薄膜结晶较大,光学和电学性能好于CBD方法制备的薄膜,太阳能电池的光电转换效率达到10.9%.CSS方法镀膜速度快,真空环境工作,有利于大规模产业化应用.

  5. Resonant infrared pulsed laser deposition of cyclic olefin copolymer films

    Science.gov (United States)

    Singaravelu, S.; Klopf, J. M.; Schriver, K. E.; Park, H. K.; Kelley, M. J.; Haglund, R. F.

    2014-03-01

    Barrier materials on thin-film organic optoelectronic devices inhibit the uptake of water, oxygen, or environmental contaminants, and fabricating them is a major challenge. By definition, these barrier layers must be insoluble, so the usual routes to polymer- or organic-film deposition by spin coating are not problematic. In this paper, we report comparative studies of pulsed laser deposition of cyclic olefin copolymer (COC), an excellent moisture barrier and a model system for a larger class of protective materials that are potentially useful in organic electronic devices, such as organic light-emitting diodes (OLEDs). Thin films of COC were deposited by resonant and nonresonant infrared pulsed laser ablation of solid COC targets, using a free-electron laser tuned to the 3.43 μm C-H stretch of the COC, and a high-intensity nanosecond Q-switched laser operated at 1064 nm. The ablation craters and deposited films were characterized by scanning-electron microscopy, Fourier-transform infrared spectrometry, atomic-force microscopy, high-resolution optical microscopy, and surface profilometry. Thermal-diffusion calculations were performed to determine the temperature rise induced in the film at the C-H resonant wavelength. The results show that resonant infrared pulsed laser deposition (RIR-PLD) is an effective, low-temperature thin-film deposition technique that leads to evaporation and deposition of intact molecules in homogeneous, smooth films. Nonresonant PLD, on the other hand, leads to photothermal damage, degradation of the COC polymers, and to the deposition only of particulates.

  6. Strontium-Doped Lanthanum Manganite Films Prepared by Magnetic Deposition

    DEFF Research Database (Denmark)

    Menon, Mohan; Larsen, Casper; Andersen, Kjeld Bøhm

    2009-01-01

    with the concentration of the suspension. Deposition phenomena were explained by modeling the magnetic flux in the deposition cell. Particles aligned with the flux lines, forming chains of LSM particles that, upon sintering, resulted in the formation of porous films with long chains of LSM grains....

  7. Ubiquitous pentacene monolayer on metals deposited onto pentacene films.

    Science.gov (United States)

    Jaeckel, B; Sambur, J B; Parkinson, B A

    2007-11-01

    Photoelectron spectroscopy (XPS and UPS) was used to study the deposition of metal layers (Ag, Cu, and Au) onto pentacene films. Very low work functions were measured (PhiAg = 3.91 eV, PhiCu = 3.93 eV, and PhiAu = 4.3 eV) for all of the metals, in agreement with results from the literature. The intensities of the C 1s core-level signals from pentacene that were monitored during stepwise metal deposition leveled off at a value of about 30% of a thick pentacene film. This C 1s intensity is comparable to that of one monolayer of pentacene deposited onto the respective metal. The valence band spectra of metals deposited onto pentacene and spectra collected for pentacene deposited onto bare metal surfaces are very similar. These findings lead to the conclusion that approximately one monolayer of pentacene is always present on top of the freshly deposited metal film, which explains the very low work function of the metals when they are deposited onto organic films. We expect similar behavior with other nonreactive metals deposited onto stable organic layers.

  8. Vacuum deposition of stoichiometric crystalline PbS films: The effect of sulfurizing environment during deposition

    Science.gov (United States)

    Singh, B. P.; Kumar, R.; Kumar, A.; Tyagi, R. C.

    2015-10-01

    Thin film of lead sulfide (PbS) was deposited onto highly cleaned glass and quartz substrates using a vacuum thermal evaporation technique. The effect of the sulfurizing environment on the growth and properties of vacuum-deposited PbS thin film was studied. The ambient sulfurizing environment was created by thermal decomposition of thiourea inside the vacuum chamber during deposition to maintain the stoichiometry and quality of the PbS film. The sulfurizing gas H2S, produced in the thermal decomposition of the solid sulfur containing thiourea readily combines with the cations (Pb2+) without leaving any anions (S2-) at the substrates and also has not produced any excess of sulfur at the substrates. The deposited film was characterized by optical spectroscopy, x-ray diffraction patterns, scanning electron micrographs with energy dispersive analysis of x-rays, and atomic force micrographs. The physical characterization of the deposited PbS film revealed that the surface of film grown in the sulfurizing environment improved and contained more stoichiometric sulfur in comparison to film deposited without the sulfurizing environment.

  9. Thin-film organic photonics molecular layer deposition and applications

    CERN Document Server

    Yoshimura, Tetsuzo

    2011-01-01

    Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves ""three-dimensional growth"". MLD facilitates dot-by-dot--o

  10. Anomalous hysteresis properties of iron films deposited on liquid surfaces

    Science.gov (United States)

    Ye, Quan-Lin; Feng, Chun-Mu; Xu, Xiao-Jun; Jin, Jin-Sheng; Xia, A.-Gen; Ye, Gao-Xiang

    2005-07-01

    A nearly free sustained iron film system, deposited on silicone oil surfaces by vapor-phase deposition method, has been fabricated and its crystal structure as well as magnetic properties has been studied. Both the temperature-dependent coercivity Hc(T) and exchange anisotropy field HE(T) of the iron films possess a maximum peak around the critical temperature Tcrit=10-15 and 4K, respectively. Our experimental results show that the anomalous hysteresis properties mainly result from the oxide surfaces of the films with spin-glass-like phase below freezing temperature Tf=30-50K.

  11. Deposit of thin films for Tokamaks conditioning

    International Nuclear Information System (INIS)

    discharge plasma, created in a calibrated mixture of methane-hydrogen during the hydrogenated amorphous carbon film deposit on the vessel wall of Novillo tokamak, were determined by mass spectrometry. By way of measuring the emission lines of the carbon and oxygen impurities in intense discharges, the time required by the plasma to interact with the wall was estimated. In addition to it, the temporal conduct of the emission line intensity of these impurities was observed by means of an intensified CCD detector. Once an ∼ 10 % of helium was introduced in the operating gas of the tokamak discharges, a 25-42 eV time variation of the electron temperature was measured using the intensity ratio technique. (Author)

  12. Chemical vapor deposition reactor. [providing uniform film thickness

    Science.gov (United States)

    Chern, S. S.; Maserjian, J. (Inventor)

    1977-01-01

    An improved chemical vapor deposition reactor is characterized by a vapor deposition chamber configured to substantially eliminate non-uniformities in films deposited on substrates by control of gas flow and removing gas phase reaction materials from the chamber. Uniformity in the thickness of films is produced by having reactive gases injected through multiple jets which are placed at uniformally distributed locations. Gas phase reaction materials are removed through an exhaust chimney which is positioned above the centrally located, heated pad or platform on which substrates are placed. A baffle is situated above the heated platform below the mouth of the chimney to prevent downdraft dispersion and scattering of gas phase reactant materials.

  13. Tungsten trioxide thin films prepared by electrostatic spray deposition technique

    International Nuclear Information System (INIS)

    Tungsten trioxide (WO3) thin films deposited on a Pt-coated alumina substrate using the electrostatic spray deposition (ESD) technique is reported in this paper. As precursor solution, tungsten (VI) ethoxide in ethanol was used. The morphology and the microstructure of the films were studied using scanning electron microscopy coupled with energy dispersive X-ray analysis, transmission electron microscopy, X-ray diffraction, and Raman spectroscopy. Dense to porous morphologies were obtained by tuning the deposition temperature. Impedance spectroscopy and current-voltage measurements were used to study the electrical behaviour of the films in air, in temperature range 300-500 deg. C. The activation energy was estimated from Arrhenius plots. Considering the obtained results, the ESD technique proved to be an effective technique for the fabrication of porous tungsten trioxide thin films

  14. Plasma deposition of polymer composite films incorporating nanocellulose whiskers

    Science.gov (United States)

    Samyn, P.; Airoudj, A.; Laborie, M.-P.; Mathew, A. P.; Roucoules, V.

    2011-11-01

    In a trend for sustainable engineering and functionalization of surfaces, we explore the possibilities of gas phase processes to deposit nanocomposite films. From an analysis of pulsed plasma polymerization of maleic anhydride in the presence of nanocellulose whiskers, it seems that thin nanocomposite films can be deposited with various patterns. By specifically modifying plasma parameters such as total power, duty cycle, and monomer gas pressure, the nanocellulose whiskers are either incorporated into a buckled polymer film or single nanocellulose whiskers are deposited on top of a polymeric film. The density of the latter can be controlled by modifying the exact positioning of the substrate in the reactor. The resulting morphologies are evaluated by optical microscopy, AFM, contact angle measurements and ellipsometry.

  15. Aerosol deposition of (Cu,Ti) substituted bismuth vanadate films

    International Nuclear Information System (INIS)

    Bismuth vanadate, Bi4V2O11, and related compounds with various metal (Me) substitutions, Bi4(MexV1−x)2O11−δ, show some of the highest ionic conductivities among the known solid oxide electrolytes. Films of Cu and Ti substituted bismuth vanadate were prepared by an aerosol deposition method, a spray coating process also described as room temperature impact consolidation. Resultant films, several microns in thickness, were dense with good adhesion to the substrate. Scanning electron microscopy and high temperature X-ray diffraction were used to monitor the effects of temperature on the structure and microstructure of the film. The particle size remained nano-scale while microstrain decreased rapidly up to 500 °C, above which coarsening and texturing increased rapidly. Impedance measurements of films deposited on inter-digital electrodes revealed an annealing effect on the ionic conductivity, with the conductivity exceeding that of a screen printed film, and approaching that of bulk ceramic. - Highlights: • Cu and Ti doped bismuth vanadate films were prepared by aerosol deposition (AD). • Dense 3–5 μm thick films were deposited on alumina, silicon and gold electrodes. • Annealing of the AD-layer increases the conductivity by 1.5 orders of magnitude. • Effect of temperature on structure and microstructure was investigated

  16. Aerosol deposition of (Cu,Ti) substituted bismuth vanadate films

    Energy Technology Data Exchange (ETDEWEB)

    Exner, Jörg, E-mail: Functional.Materials@Uni-Bayreuth.de [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany); Fuierer, Paul [Materials and Metallurgical Engineering Department, New Mexico Institute of Mining and Technology, Socorro, NM 87801 (United States); Moos, Ralf [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany)

    2014-12-31

    Bismuth vanadate, Bi{sub 4}V{sub 2}O{sub 11}, and related compounds with various metal (Me) substitutions, Bi{sub 4}(Me{sub x}V{sub 1−x}){sub 2}O{sub 11−δ}, show some of the highest ionic conductivities among the known solid oxide electrolytes. Films of Cu and Ti substituted bismuth vanadate were prepared by an aerosol deposition method, a spray coating process also described as room temperature impact consolidation. Resultant films, several microns in thickness, were dense with good adhesion to the substrate. Scanning electron microscopy and high temperature X-ray diffraction were used to monitor the effects of temperature on the structure and microstructure of the film. The particle size remained nano-scale while microstrain decreased rapidly up to 500 °C, above which coarsening and texturing increased rapidly. Impedance measurements of films deposited on inter-digital electrodes revealed an annealing effect on the ionic conductivity, with the conductivity exceeding that of a screen printed film, and approaching that of bulk ceramic. - Highlights: • Cu and Ti doped bismuth vanadate films were prepared by aerosol deposition (AD). • Dense 3–5 μm thick films were deposited on alumina, silicon and gold electrodes. • Annealing of the AD-layer increases the conductivity by 1.5 orders of magnitude. • Effect of temperature on structure and microstructure was investigated.

  17. Deposition of antimony telluride thin film by ECALE

    Institute of Scientific and Technical Information of China (English)

    GAO; Xianhui; YANG; Junyou; ZHU; Wen; HOU; Jie; BAO; Siqian; FAN; Xi'an; DUAN; Xingkai

    2006-01-01

    The process of Sb2Te3 thin film growth on the Pt substrate by electrochemical atomic layer epitaxy (ECALE) was studied. Cyclic voltammetric scanning was performed to analyze the electrochemical behavior of Te and Sb on the Pt substrate. Sb2Te3 film was formed using an automated flow deposition system by alternately depositing Te and Sb atomic layers for 400 circles. The deposited Sb2Te3 films were characterized by XRD, EDX, FTIR and FESEM observation. Sb2Te3 compound structure was confirmed by XRD pattern and agreed well with the results of EDX quantitative analysis and coulometric analysis. FESEM micrographs showed that the deposit was composed of fine nano particles with size of about 20 nm. FESEM image of the cross section showed that the deposited films were very smooth and dense with thickness of about 190 nm. The optical band gap of the deposited Sb2Te3 film was determined as 0.42 eV by FTIR spectroscopy, and it was blue shifted in comparison with that of the bulk Sb2Te3 single crystal due to its nanocrystalline microstructure.

  18. UV laser deposition of metal films by photogenerated free radicals

    Science.gov (United States)

    Montgomery, R. K.; Mantei, T. D.

    1986-01-01

    A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

  19. Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films

    Directory of Open Access Journals (Sweden)

    Chang-Ho Choi

    2014-05-01

    Full Text Available State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer opportunities to fabricate compound semiconductors at lower temperatures and lower capital costs. Among many solution-based deposition processes, chemical bath deposition is an attractive technique for depositing semiconductor films, owing to its low temperature, low cost and large area deposition capability. Chemical bath deposition processes are mainly performed using batch reactors, where all reactants are fed into the reactor simultaneously and products are removed after the processing is finished. Consequently, reaction selectivity is difficult, which can lead to unwanted secondary reactions. Microreactor-assisted solution deposition processes can overcome this limitation by producing short-life molecular intermediates used for heterogeneous thin film synthesis and quenching the reaction prior to homogeneous reactions. In this paper, we present progress in the synthesis and deposition of semiconductor thin films with a focus on CdS using microreactor-assisted solution deposition and provide an overview of its prospect for scale-up.

  20. Sputter deposited Terfenol-D thin films for multiferroic applications

    Science.gov (United States)

    Mohanchandra, K. P.; Prikhodko, S. V.; Wetzlar, K. P.; Sun, W. Y.; Nordeen, P.; Carman, G. P.

    2015-09-01

    In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm) with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011) cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10-6.

  1. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  2. Electrostatic spray deposited zinc oxide films for gas sensor applications

    International Nuclear Information System (INIS)

    In this work, thin films of zinc oxide (ZnO) for gas-sensor applications were deposited on platinum coated alumina substrate, using electrostatic spray deposition (ESD) technique. As precursor solution zinc acetate in ethanol was used. Scanning electron microscopy (SEM) evaluation showed a porous and homogeneous film morphology and the energy dispersive X-ray analysis (EDX) confirmed the composition of the films with no presence of other impurities. The microstructure studied with X-ray diffraction (XRD) and Raman spectroscopy indicated that the ZnO oxide films are crystallized in a hexagonal wurtzite phase. The films showed good sensitivity to 1 ppm nitrogen dioxide (NO2) at 300 oC while a much lower sensitivity to 12 ppm hydrogen sulphide (H2S)

  3. 15.1% highly efficient thin film CdS/CdTe solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Kumazawa, S.; Shibutani, S.; Nishio, T.; Aramoto, T.; Higuchi, H.; Arita, T.; Hanafusa, A.; Omura, K.; Murozono, M. [Matsushita Battery Ind. Co., Ltd., Osaka (Japan); Takakura, H. [Faculty of Science and Engineering, Ritsumeikan University, Shiga (Japan)

    1997-10-21

    High-efficiency CdS/CdTe solar cells with thin CdS film have recently been developed. Semiconductive layers of CdS via the CVD method and of CdTe via the CSS method were deposited on an ITO/no.7059 substrate. Cell performance depends primarily on the thickness of CdS film, and the conversion efficiency is highest for a CdS film thickness of around 60 nm. Since the CdS film thickness decreases by about 30% during deposition of the CdTe layer, a thickness of 95 nm is required to obtain a 60 nm-thick CdS film after deposition of a CdTe layer. By observing the CdS film during the CdTe deposition process, a decrease was detected before CdTe layer completely covers the surface of the CdS film. By optimizing the thickness of CdS film, an efficiency of 15.12% for the best cell under AM 1.5 verified at JQA was obtained. This fabrication process has good reproducibility; 92.5% of 1 cm{sup 2} solar cells fabricated under the same conditions have efficiencies above 14%

  4. Recent Developments of Flexible CdTe Solar Cells on Metallic Substrates: Issues and Prospects

    Directory of Open Access Journals (Sweden)

    M. M. Aliyu

    2012-01-01

    Full Text Available This study investigates the key issues in the fabrication of CdTe solar cells on metallic substrates, their trends, and characteristics as well as effects on solar cell performance. Previous research works are reviewed while the successes, potentials, and problems of such technology are highlighted. Flexible solar cells offer several advantages in terms of production, cost, and application over glass-based types. Of all the metals studied as substrates for CdTe solar cells, molybdenum appears the most favorable candidate, while close spaced sublimation (CSS, electrodeposition (ED, magnetic sputtering (MS, and high vacuum thermal evaporation (HVE have been found to be most common deposition technologies used for CdTe on metal foils. The advantages of these techniques include large grain size (CSS, ease of constituent control (ED, high material incorporation (MS, and low temperature process (MS, HVE, ED. These invert-structured thin film CdTe solar cells, like their superstrate counterparts, suffer from problems of poor ohmic contact at the back electrode. Thus similar strategies are applied to minimize this problem. Despite the challenges faced by flexible structures, efficiencies of up to 13.8% and 7.8% have been achieved in superstrate and substrate cell, respectively. Based on these analyses, new strategies have been proposed for obtaining cheaper, more efficient, and viable flexible CdTe solar cells of the future.

  5. Electrophoretic deposition of tannic acid-polypyrrolidone films and composites.

    Science.gov (United States)

    Luo, Dan; Zhang, Tianshi; Zhitomirsky, Igor

    2016-05-01

    Thin films of polyvinylpyrrolidone (PVP)-tannic acid (TA) complexes were prepared by a conceptually new strategy, based on electrophoretic deposition (EPD). Proof of concept investigations involved the analysis of the deposition yield, FTIR and UV-vis spectroscopy of the deposited material, and electron microscopy studies. The analysis of the deposition mechanism indicated that the limitations of the EPD in the deposition of small phenolic molecules, such as TA, and electrically neutral polymers, similar to PVP, containing hydrogen-accepting carbonyl groups, can be avoided. The remarkable adsorption properties of TA and film forming properties of the PVP-TA complexes allowed for the EPD of materials of different types, such as huntite mineral platelets and hydrotalcite clay particles, TiO2 and MnO2 oxide nanoparticles, multiwalled carbon nanotubes, TiN and Pd nanoparticles. Moreover, PVP-TA complexes were used for the co-deposition of different materials and formation of composite films. In another approach, TA was used as a capping agent for the hydrothermal synthesis of ZnO nanorods, which were then deposited by EPD using PVP-TA complexes. The fundamental adsorption and interaction mechanisms of TA involved chelation of metal atoms on particle surfaces with galloyl groups, π-π interactions and hydrogen bonding. The films prepared by EPD can be used for various applications, utilizing functional properties of TA, PVP, inorganic and organic materials of different types and their composites. PMID:26878711

  6. High-quality AlN films grown on chemical vapor-deposited graphene films

    Directory of Open Access Journals (Sweden)

    Chen Bin-Hao

    2016-01-01

    Full Text Available We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  7. High-quality AlN films grown on chemical vapor-deposited graphene films

    OpenAIRE

    Chen Bin-Hao; Hsu Hsiu-Hao; Lin David T.W.

    2016-01-01

    We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  8. Large-Scale Graphene Film Deposition for Monolithic Device Fabrication

    Science.gov (United States)

    Al-shurman, Khaled

    Since 1958, the concept of integrated circuit (IC) has achieved great technological developments and helped in shrinking electronic devices. Nowadays, an IC consists of more than a million of compacted transistors. The majority of current ICs use silicon as a semiconductor material. According to Moore's law, the number of transistors built-in on a microchip can be double every two years. However, silicon device manufacturing reaches its physical limits. To explain, there is a new trend to shrinking circuitry to seven nanometers where a lot of unknown quantum effects such as tunneling effect can not be controlled. Hence, there is an urgent need for a new platform material to replace Si. Graphene is considered a promising material with enormous potential applications in many electronic and optoelectronics devices due to its superior properties. There are several techniques to produce graphene films. Among these techniques, chemical vapor deposition (CVD) offers a very convenient method to fabricate films for large-scale graphene films. Though CVD method is suitable for large area growth of graphene, the need for transferring a graphene film to silicon-based substrates is required. Furthermore, the graphene films thus achieved are, in fact, not single crystalline. Also, graphene fabrication utilizing Cu and Ni at high growth temperature contaminates the substrate that holds Si CMOS circuitry and CVD chamber as well. So, lowering the deposition temperature is another technological milestone for the successful adoption of graphene in integrated circuits fabrication. In this research, direct large-scale graphene film fabrication on silicon based platform (i.e. SiO2 and Si3N4) at low temperature was achieved. With a focus on low-temperature graphene growth, hot-filament chemical vapor deposition (HF-CVD) was utilized to synthesize graphene film using 200 nm thick nickel film. Raman spectroscopy was utilized to examine graphene formation on the bottom side of the Ni film

  9. Thin film solar cells based on CdTe and Cu(In,Ga)Se{sub 2} (CIGS) compounds

    Energy Technology Data Exchange (ETDEWEB)

    Gladyshev, P P [International University of Nature, Society and Man ' Dubna' , Dubna (Russian Federation); Filin, S V; Puzynin, A I; Tanachev, I A; Rybakova, A V; Tuzova, V V; Kozlovskiy, S A [Center of High Technologies of FSUE ' Applied Acoustics Research Institute' , Dubna (Russian Federation); Gremenok, V F; Mudryi, A V; Zaretskaya, E P [State Scientific and Production Association ' Scientific-Practical Materials, Researcher Center of National Academy of Sciences of Belarus' , Minsk (Belarus); Zalesskiy, V B; Kravchenko, V M; Leonova, U R; Khodin, A A; Pilipovich, V A; Polikanin, A M [Institute of Physics of National Academy of Sciences of Belarus, Minsk (Belarus); Khrypunov, G S; Chernyh, E P; Kovtun, N A [National Technical University ' Kharkov Politechnical Institute' , Kharkov (Ukraine); Belonogov, E K, E-mail: pavel.gladyshev@niipa.ru [Voronej State Technical University, Voronej (Russian Federation)

    2011-04-01

    We are publishing recent results in chalcogenide photoelectric convertors fabrication, which are efforts of many scientific teams from Russia, Belarus, Ukraine, and Kazakhstan. Competitively high efficiency of photoelectric convertors (11.4% for CdTe and 11% for CIGS) was achieved in the process of our work. Furthermore, luminescent filters for improvement of spectral response of such chalcogenide solar cells in a short wavelengths region were also developed and investigated here.

  10. Performance of thin-film CdS/CdTe solar cells

    Science.gov (United States)

    Hussain, O. M.; Reddy, P. J.

    1991-07-01

    A polycrystalline thin-film CdS/CdTe solar cell has been fabricated by means of a laser evaporation of CdTe onto thermally-evaporated CdS films. The cell has demonstrated a maximum efficiency of about 8.25 percent, in conjunction with a quantum efficiency of about 80 percent. The In-doped CdS 0.5-micron thick films were deposited onto conducting glass substrates at 473 K and annealed at 673 K in a hydrogen atmosphere; the Sb-doped CdTe 5-micron thickness films were deposited and then heat-treated in air at 673 K.

  11. Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

    International Nuclear Information System (INIS)

    Tellurite (TeO2-TiO2-Nb2O5) thin film glasses have been produced by pulsed laser deposition at room temperature at laser energy densities in the range of 0.8-1.5 J/cm2 and oxygen pressures in the range of 3-11 Pa. The oxygen concentration in the films increases with laser energy density to reach values very close to that of the bulk glass at 1.5 J/cm2, while films prepared at 1.5 J/cm2 and pressures above 5 Pa show oxygen concentration in excess of 10% comparing to the glass. X-ray photoelectron spectroscopy shows the presence of elementary Te in films deposited at O2 pressures ≤ 5 Pa that is not detected at higher pressures, while analysis of Raman spectra of the samples suggests a progressive substitution of TeO3 trigonal pyramids by TeO4 trigonal bipyramids in the films when increasing their oxygen content. Spectroscopic ellipsometry analysis combined with Cauchy and effective medium modeling demonstrates the influence of these compositional and structural modifications on the optical response of the films. Since the oxygen content determines their optical response through the structural modifications induced in the films, those can be effectively controlled by tuning the deposition conditions, and films having large n (2.08) and reduced k (-4) at 1.5 μm have been produced using the optimum deposition conditions.

  12. Electron bombardment of certain thin films during deposition

    International Nuclear Information System (INIS)

    The performance of multilayer thin film optical filters was studied. In 1947, R.M. Rice established the technique of bombarding the substrate with electrons of several kilovolts as the films were being deposited. This process improved the durability of zinc sulfide films dramatically. An electron source filament was installed inside the coating chamber and electrically isolated the substrate holder, which was connected to a positive high voltage supply. An accelerating loop placed just above the filament enchanced its efficiency. The source was calibrated by measuring the current through the substrate holder. Single layer films of five different materials were deposited, each at its own set of electron bombardment parameters. The microstructure was analyzed. Antimony trioxide films showed a shift in lattice orientation, but this did not affect columnar structure or macroscopic quantities. Potassium hexafluorozirconate films showed elimination of both crystal structure and columnar growth, resulting in slightly reduced durability and some absorption. Silicon monoxide films suffered no change in structure or properties. Zinc sulfide films demonstrated the change in crystal structure, which was quantified and shown to improve moisture resistance. Optical properties were unaffected. Magnesium fluoride films showed a slight increase in crystallinity with only subtle changes in durability and optical properties. Generally, electron bombardment reduced or rearranged crystal structure

  13. Reactive DC Magnetron Sputtering Deposition of Copper Nitride Thin Film

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Copper nitride thin film was deposited on glass substrates by reactive DC (direct current) magnetron sputtering at a 0.5 Pa N2 partial pressure and different substrate temperatures. The as-prepared film, characterized with X-Ray diffraction, atomic force microscopy, and X-ray photoelectron spectroscopy measurements, showed a composed structure of Cu3N crystallites with anti-ReO3 structure and a slight oxidation of the resulted film.The crystal structure and growth rate of Cu3N films were affected strongly by substrate temperature. The preferred crystalline orientation of Cu3N films were (111) and (200) at RT, 100℃. These peaks decayed at 200℃ and 300℃ only Cu (111) peak was noticed. Growth of Cu3N films at 100℃ is the optimum substrate temperature for producing high-quality (111) Cu3N films. The deposition rate of Cu3N films estimated to be in range of 18-30 nm/min increased while the resistivity and the microhardness of Cu3N films decreased when the temperature of glass substrate increased.

  14. Pulsed laser deposition of niobium nitride thin films

    International Nuclear Information System (INIS)

    Niobium nitride (NbNx) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbNx films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ∼40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbNx films from mixed β-Nb2N and cubic δ-NbN phases to single hexagonal β-Nb2N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbNx deposited on Si(100) were also investigated. The NbNx films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbNx film morphology and phase

  15. Pulsed laser deposition of niobium nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Farha, Ashraf Hassan, E-mail: ahass006@odu.edu; Elsayed-Ali, Hani E., E-mail: helsayed@odu.edu [Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, VA 23529 (United States); Applied Research Center, Jefferson National Accelerator Facility, Newport News, VA 23606 (United States); Department of Physics, Faculty of Science, Ain Shams University, Cairo 11566 (Egypt); Ufuktepe, Yüksel, E-mail: ufuk@cu.edu.tr [Department of Physics, University of Cukurova, 01330 Adana (Turkey); Myneni, Ganapati, E-mail: rao@jlab.org [Thomas Jefferson National Accelerator Facility, Newport News, Virginia 23606 (United States)

    2015-12-04

    Niobium nitride (NbN{sub x}) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbN{sub x} films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ∼40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbN{sub x} films from mixed β-Nb{sub 2}N and cubic δ-NbN phases to single hexagonal β-Nb{sub 2}N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbN{sub x} deposited on Si(100) were also investigated. The NbN{sub x} films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbN{sub x} film morphology and phase.

  16. Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor

    Energy Technology Data Exchange (ETDEWEB)

    Song Xuemei; Gopireddy, Deepthi [Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607 (United States); Takoudis, Christos G. [Department of Chemical Engineering, University of Illinois at Chicago, Chicago, Illinois 60607 (United States); Department of Bioengineering, University of Illinois at Chicago, Chicago, Illinois 60607 (United States)], E-mail: takoudis@uic.edu

    2008-07-31

    In this study, we investigate the use of an amide-based Ti-containing precursor, namely tetrakis(diethylamido)titanium (TDEAT), for TiN{sub x}O{sub y} film deposition at low temperature. Traditionally, alkoxide-based Ti-containing precursor, such as titanium tetra-isopropoxide (TTIP), along with NH{sub 3} is used for titanium oxynitride (TiN{sub x}O{sub y}) film deposition. When TTIP is used, at low temperatures it is difficult to form TiN{sub x}O{sub y} films with high N/O ratios. In this study, by using TDEAT, TiN{sub x}O{sub y} films are deposited on H-passivated Si (100) substrates in a cold wall reactor at 300 {sup o}C and 106 Pa. Rutherford backscattering spectroscopy analysis shows nitrogen incorporation in the TiN{sub x}O{sub y} films to be as high as 28 at.%. X-ray photoelectron spectroscopy analysis of as-deposited films confirms the formation of{sub .} TiN{sub x}O{sub y}, while Fourier transform infrared and Raman spectra indicate that the films have amorphous structure. Moreover, there is no detectable bulk carbon impurity and no SiO{sub 2} formation at the TiN{sub x}O{sub y}/Si interface. Upon annealing the as-deposited films in air at 750 deg. C for 30 min, they oxidize to TiO{sub 2} and crystallize to form a rutile structure with a small amount of anatase phase. Based on these results, TDEAT appears to be a promising precursor for both TiN{sub x}O{sub y} and TiO{sub 2} film deposition.

  17. XPS Study of CdTe Thin Films Doped with Gd%掺Gd-CdTe薄膜的XPS研究

    Institute of Scientific and Technical Information of China (English)

    安晓晖; 李蓉萍; 田磊; 何志刚; 吴蓉; 李忠贤

    2012-01-01

    CdTe thin film doped with Gd has been obtained by vacuum evaporation technique with two sources , and chemical state has been studied by X-ray photo-electron spectroscopy. XPS data show that Cd,Te,O,C and Gd elements exist on the surface of the film. C1s and O1s binding energy indicates that the two elements mainly exist in the form of physical adsorption. The experiment results show that Cd and Te atoms exist in oxidation state as in well as in CdTe. Due to carbon pol-lution, Gd element does not appear on the surface, only appears in the etching process. Erosion analysis shows the Cd element s content is greater than Te, and the ratio between them tends to 1:0. 8.%应用双源法真空蒸发制备掺Gd的CdTe薄膜,并借助XPS对其进行组份分析.实验表明,Gd掺杂的CdTe薄膜的组分为Cd、Te、O、C、Gd等元素,其中C、O主要以物理吸附方式存在于薄膜表面;Cd、Te元素的存在方式为CdTe化合物及其氧化物形式;而Gd元素由于碳污染的原因在其表面未曾出现,只在刻蚀过程中出现;深度剥蚀分析表明在样品内部Cd元素的含量大于Te元素的含量,且接近于1∶0.8,趋于稳定.

  18. Effect of film thickness on electrochromic activity of spray deposited iridium oxide thin films

    International Nuclear Information System (INIS)

    Electrochromic iridium oxide thin films were deposited onto fluorine doped tin oxide (FTO) coated glass substrates from an aqueous iridium chloride solution using a spray pyrolysis process. The deposition temperature was 250 deg. C. The solution quantity was varied from 25 to 55 ml to obtain films with different thickness. The as-deposited samples were X-ray amorphous. The electrochromic properties were studied in proton containing electrolyte (0.5N, H2SO4) using cyclic voltammetry, chronoamperometry and spectrophotometry techniques. The films exhibit anodic electrochromism. The colouration efficiency at 630 nm was maximum for thicker sample, owing to its large charge storage capacity and hydration

  19. Effect of film thickness on electrochromic activity of spray deposited iridium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Patil, P.S. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India)]. E-mail: psp_phy@unishivaji.ac.in; Mujawar, S.H. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India); Sadale, S.B. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India); Deshmukh, H.P. [Department of Physics, Bharati Vidyapeeth, Deemed University, Y.M. College, Pune (India); Inamdar, A.I. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India)

    2006-10-10

    Electrochromic iridium oxide thin films were deposited onto fluorine doped tin oxide (FTO) coated glass substrates from an aqueous iridium chloride solution using a spray pyrolysis process. The deposition temperature was 250 deg. C. The solution quantity was varied from 25 to 55 ml to obtain films with different thickness. The as-deposited samples were X-ray amorphous. The electrochromic properties were studied in proton containing electrolyte (0.5N, H{sub 2}SO{sub 4}) using cyclic voltammetry, chronoamperometry and spectrophotometry techniques. The films exhibit anodic electrochromism. The colouration efficiency at 630 nm was maximum for thicker sample, owing to its large charge storage capacity and hydration.

  20. Chemical vapor deposition and characterization of titanium dioxide thin films

    Science.gov (United States)

    Gilmer, David Christopher

    1998-12-01

    The continued drive to decrease the size and increase the speed of micro-electronic Metal-Oxide-Semiconductor (MOS) devices is hampered by some of the properties of the SiOsb2 gate dielectric. This research has focused on the CVD of TiOsb2 thin films to replace SiOsb2 as the gate dielectric in MOS capacitors and transistors. The relationship of CVD parameters and post-deposition anneal treatments to the physical and electrical properties of thin films of TiOsb2 has been studied. Structural and electrical characterization of TiOsb2 films grown from the CVD precursors tetraisopropoxotitanium (IV) (TTIP) and TTIP plus Hsb2O is described in Chapter 3. Both types of deposition produced stoichiometric TiOsb2 films comprised of polycrystalline anatase, but the interface properties were dramatically degraded when water vapor was added. Films grown with TTIP in the presence of Hsb2O contained greater than 50% more hydrogen than films grown using only TTIP and the hydrogen content of films deposited in both wet and dry TTIP environments decreased sharply with a post deposition Osb2 anneal. A significant thickness variation of the dielectric constant was observed which could be explained by an interfacial oxide and the finite accumulation thickness. Fabricated TiOsb2 capacitors exhibited electrically equivalent SiOsb2 gate dielectric thicknesses and leakage current densities as low as 38, and 1×10sp{-8} Amp/cmsp2 respectively. Chapter 4 discusses the low temperature CVD of crystalline TiOsb2 thin films deposited using the precursor tetranitratotitanium (IV), TNT, which produces crystalline TiOsb2 films of the anatase phase in UHV-CVD at temperatures as low as 184sp°C. Fabricated TiOsb2 capacitors exhibited electrically equivalent SiOsb2 gate dielectric thicknesses and leakage current densities as low as 17, and 1×10sp{-8} Amp/cmsp2 respectively. Chapter 5 describes the results of a comparison of physical and electrical properties between TiOsb2 films grown via LPCVD using

  1. Deposition of Thin Film Electrolyte by Pulsed Laser Deposition (PLD) for micro-SOFC Development

    OpenAIRE

    Krogstad, Hedda Nordby

    2012-01-01

    Optimalization of PLD deposition of YSZ for micr-SOFC electrolyte applications by varying deposition pressure and target-substrate distance.Substrate used was Si-based chips and wafers (large area PLD), and the substrate temperature was held at 600. Dense films were obtained at 20 mTorr.

  2. CdS films deposited by chemical bath under rotation

    Energy Technology Data Exchange (ETDEWEB)

    Oliva-Aviles, A.I., E-mail: aoliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico); Patino, R.; Oliva, A.I. [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico)

    2010-08-01

    Cadmium sulfide (CdS) films were deposited on rotating substrates by the chemical bath technique. The effects of the rotation speed on the morphological, optical, and structural properties of the films were discussed. A rotating substrate-holder was fabricated such that substrates can be taken out from the bath during the deposition. CdS films were deposited at different deposition times (10, 20, 30, 40 and 50 min) onto Corning glass substrates at different rotation velocities (150, 300, 450, and 600 rpm) during chemical deposition. The chemical bath was composed by CdCl{sub 2}, KOH, NH{sub 4}NO{sub 3} and CS(NH{sub 2}){sub 2} as chemical reagents and heated at 75 deg. C. The results show no critical effects on the band gap energy and the surface roughness of the CdS films when the rotation speed changes. However, a linear increase on the deposition rate with the rotation energy was observed, meanwhile the stoichiometry was strongly affected by the rotation speed, resulting a better 1:1 Cd/S ratio as speed increases. Rotation effects may be of interest in industrial production of CdTe/CdS solar cells.

  3. Fractal structure of films deposited in a tokamak

    Science.gov (United States)

    Budaev, V. P.; Khimchenko, L. N.

    2007-04-01

    The surface of amorphous films deposited in the T-10 tokamak was studied in a scanning tunnel microscope. The surface relief on a scale from 10 nm to 100 μm showed a stochastic surface topography and revealed a hierarchy of grains. The observed variety of irregular structures of the films was studied within the framework of the concept of scale invariance using the methods of fractal geometry and statistical physics. The experimental probability density distribution functions of the surface height variations are close in shape to the Cauchy distribution. The stochastic surface topography of the films is characterized by a Hurst parameter of H = 0.68-0.85, which is evidence of a nontrivial self-similarity of the film structure. The fractal character and porous structure of deposited irregular films must be considered as an important issue related to the accumulation of tritium in the ITER project. The process of film growth on the surface of tokamak components exposed to plasma has been treated within the framework of the general concept of inhomogeneous surface growth. A strong turbulence of the edge plasma in tokamaks can give rise to fluctuations in the incident flux of particles, which leads to the growth of fractal films with grain dimensions ranging from nano-to micrometer scale. The shape of the surface of some films found in the T-10 tokamak has been interpreted using a model of diffusion-limited aggregation (DLA). The growth of films according to the discrete DLA model was simulated using statistics of fluctuations observed in a turbulent edge plasma of the T-10 tokamak. The modified DLA model reproduces well the main features of the surface of some films deposited in tokamaks.

  4. Deposition and characterization of Ru thin films prepared by metallorganic chemical vapor deposition

    CERN Document Server

    Kang, S Y; Lee, S K; Hwang, C S; Kim, H J

    2000-01-01

    Ru thin films were deposited at 300 approx 400 .deg. C by using Ru(C sub 5 H sub 4 C sub 2 H sub 5) sub 2 (Ru(EtCp) sub 2) as a precursor and low-pressure metalorganic chemical vapor deposition. The addition of O sub 2 gas was essential to form Ru thin films. The deposition rates of the films were about 200 A/min. For low oxygen addition and high substrate temperature, RuO sub 2 phases were formed. Also, thermodynamic calculations showed that all the supplied oxygen was consumed to oxidize carbon and hydrogen, cracked from the precursor ligand, rather than Ru. Thus, metal films could be obtained There was an optimum oxygen to precursor ratio at which the pure Ru phase could be obtained with minimum generation of carbon and RuO sub 2

  5. Polycrystalline thin films of antimony selenide via chemical bath deposition and post deposition treatments

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez-Lazcano, Y. [Department of Solar Energy Materials, Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, Temixco, Morelos-62580 (Mexico); Pena, Yolanda [Department of Solar Energy Materials, Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, Temixco, Morelos-62580 (Mexico); Nair, M.T.S. [Department of Solar Energy Materials, Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, Temixco, Morelos-62580 (Mexico)]. E-mail: mtsn@cie.unam.mx; Nair, P.K. [Department of Solar Energy Materials, Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, Temixco, Morelos-62580 (Mexico)

    2005-12-22

    We report a method for obtaining thin films of polycrystalline antimony selenide via chemical bath deposition followed by heating the thin films at 573 K in selenium vapor. The thin films deposited from chemical baths containing one or more soluble complexes of antimony, and selenosulfate initially did not show X-ray diffraction (XRD) patterns corresponding to crystalline antimony selenide. Composition of the films, studied by energy dispersive X-ray analyses indicated selenium deficiency. Heating these films in presence of selenium vapor at 573 K under nitrogen (2000 mTorr) resulted in an enrichment of Se in the films. XRD peaks of such films matched Sb{sub 2}Se{sub 3}. Evaluation of band gap from optical spectra of such films shows absorption due to indirect transition occurring in the range of 1-1.2 eV. The films are photosensitive, with dark conductivity of about 2 x 10{sup -8} ({omega} cm){sup -1} and photoconductivity, about 10{sup -6} ({omega} cm){sup -1} under tungsten halogen lamp illumination with intensity of 700 W m{sup -2}. An estimate for the mobility life time product for the film is 4 x 10{sup -9} cm{sup 2} V{sup -1}.

  6. Thin film cadmium telluride, zinc telluride, and mercury zinc telluride solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Chu, T.L. (University of South Florida, Tampa, FL (United States))

    1992-04-01

    This report describes research to demonstrate (1) thin film cadmium telluride solar cells with a quantum efficiency of 75% or higher at 0. 44 {mu}m and a photovoltaic efficiency of 11.5% or greater, and (2) thin film zinc telluride and mercury zinc telluride solar cells with a transparency to sub-band-gap radiation of 65% and a photovoltaic conversion efficiency of 5% and 8%, respectively. Work was directed at (1) depositing transparent conducting semiconductor films by solution growth and metal-organic chemical vapor deposition (MOCVD) technique, (2) depositing CdTe films by close-spaced sublimation (CSS) and MOCVD techniques, (3) preparing and evaluating thin film CdTe solar cells, and (4) preparing and characterizing thin film ZnTe, CD{sub 1-x}Zn{sub 1-x}Te, and Hg{sub 1-x}Zn{sub x}Te solar cells. The deposition of CdS films from aqueous solutions was investigated in detail, and their crystallographic, optical, and electrical properties were characterized. CdTe films were deposited from DMCd and DIPTe at 400{degrees}C using TEGa and AsH{sub 3} as dopants. CdTe films deposited by CSS had significantly better microstructures than those deposited by MOCVD. Deep energy states in CdTe films deposited by CSS and MOCVD were investigated. Thin films of ZnTe, Cd{sub 1- x}Zn{sub x}Te, and Hg{sub 1-x}Zn{sub x}Te were deposited by MOCVD, and their crystallographic, optical, and electrical properties were characterized. 67 refs.

  7. Ultraviolet laser deposition of graphene thin films without catalytic layers

    KAUST Repository

    Sarath Kumar, S. R.

    2013-01-09

    In this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.

  8. Deposition of Cu seed layer film by supercritical fluid deposition for advanced interconnects

    Institute of Scientific and Technical Information of China (English)

    Zhao Bin; Zhao Ming-Tao; Zhang Yan-Fei; Yang Jun-He

    2013-01-01

    The deposition of a Cu seed layer film is investigated by supercritical fluid deposition (SCFD) using H2 as a reducing agent for Bis(2,2,6,6-tetramethyl-3,5-heptanedionato) copper in supercritical CO2 (scCO2).The effects of deposition temperature,precursor,and H2 concentration are investigated to optimize Cu deposition.Continuous metallic Cu films are deposited on Ru substrates at 190 ℃ when a 0.002 mol/L Cu precursor is introduced with 0.75 mol/L H2.A Cu precursor concentration higher than 0.002 mol/L is found to have negative effects on the surface qualities of Cu films.For a H2concentration above 0.56 mol/L,the root-mean-square (RMS) roughness of a Cu film decreases as the H2 concentration increases.Finally,a 20-nm thick Cu film with a smooth surface,which is required as a seed layer in advanced interconnects,is successfully deposited at a high H2 concentration (0.75 mol/L).

  9. Cobalt Xanthate Thin Film with Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    İ. A. Kariper

    2013-01-01

    Full Text Available Cobalt xanthate thin films (CXTFs were successfully deposited by chemical bath deposition, onto amorphous glass substrates, as well as on p- and n-silicon, indium tin oxide, and poly(methyl methacrylate. The structure of the films was analyzed by far-infrared spectrum (FIR, mid-infrared (MIR spectrum, nuclear magnetic resonance (NMR, and scanning electron microscopy (SEM. These films were investigated from their structural, optical, and electrical properties point of view. Electrical properties were measured using four-point method, whereas optical properties were investigated via UV-VIS spectroscopic technique. Uniform distribution of grains was clearly observed from the photographs taken by scanning electron microscope (SEM. The transmittance was about 70–80% (4 hours, 50°C. The optical band gap of the CXTF was graphically estimated to be 3.99–4.02 eV. The resistivity of the films was calculated as 22.47–75.91 Ω·cm on commercial glass depending on film thickness and 44.90–73.10 Ω ·cm on the other substrates. It has been observed that the relative resistivity changed with film thickness. The MIR and FIR spectra of the films were in agreement with the literature analogues. The expected peaks of cobalt xanthate were observed in NMR analysis on glass. The films were dipped in chloroform as organic solvent and were analyzed by NMR.

  10. The features of electrochemically deposited CdS thin films

    International Nuclear Information System (INIS)

    The stoichiometric CdS films were successfully deposited on ITO glass substrate using electrodeposition technique from non-aqueous solution of 0.055M CdCl2 and 0.19M elemental sulfur, dissolved in 50 ml. dimethyl sulfoxide at 110-120 degrees Celsius. The films were characterized for optical properties and EDX composition. The SEM images show uniform thin film CdS. EDX analyze shows that the composition of Cd and S may considered to be stoichiometric. The optical band gap of as grown CdS is measured to be 2.42 eV. In this work it is reported the synthesis of CdS thin films electrochemically deposited over conducting ITO-glass substrates and its characterization by various techniques like XRD, SEM and optical transmission spectroscopy

  11. Spray deposited titanium oxide thin films as passive counter electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Shinde, P.S.; Mujawar, S.H.; Inamdar, A.I.; Patil, P.S. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur-416004 (India); Deshmukh, H.P. [Bharati Vidyapeeth Deemed University, Yashwantrao Mohite College, Pune-411038 (India)

    2007-02-15

    Titanium dioxide (TiO{sub 2}) thin films were deposited from methanolic solution onto fluorine doped tin oxide coated conducting glass substrates by spray pyrolysis technique. The electrochemical properties of TiO{sub 2} thin films were investigated using cyclic voltammetry, chronoamperometry, chronocoulometry and iono-optical studies, in 0.1N H{sub 2}SO{sub 4} electrolyte. Performance of the films deposited at three different substrate temperatures, viz. 350, 400 and 450 C is discussed in view of their utilization in electrochromic devices, as counter electrode. The magnitude of charge storage capacity, Q/t (4.75-6.13 x 10{sup -3} mC/(cm{sup 2} nm)) and colouration efficiency (3.2-4.3 cm{sup 2}/mC) of TiO{sub 2} rank these films among the promising counter electrodes in electrochromic devices. (author)

  12. Nanocrystalline Pd alloy films coated by electroless deposition.

    Science.gov (United States)

    Strukov, G V; Strukova, G K; Batov, I E; Sakharov, M K; Kudrenko, E A; Mazilkin, A A

    2011-10-01

    The structures of palladium and palladium alloys thin films deposited from organic electrolytes onto metallic substrates by electroless plating method have been investigated. The coatings are dense, pore-free 0.005-1 microm thick films with high adhesive strength to the substrate surface. EDX, XRD, SEM and TEM methods were used to determine the composition and structure of alloy coatings of the following binary systems: Pd-Au, Pd-Ag, Pd-Ni, Pd-Pb, and ternary system Pd-Au-Ni. The coatings of Pd-Au, Pd-Ag and Pd-Ni have a solid solution structure, whereas Pd-Pb is intermetallic compound. It has been found that the deposited films consist of nanocrystalline grains with sizes in the range of 11-35 nm. Scanning and transmission electron microscopy investigations reveal the existence of clusters formed by nanocrystalline grains. The origin for the formation of nanocrystalline structures of coating films is discussed. PMID:22400291

  13. Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YAO Kailun; ZHENG Jianwan; LIU Zuli; JIA Lihui

    2007-01-01

    In this paper,the characterization of thin films,deposited with the precursor ferrocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was investigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic Force Microscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and superconducting Quantum Interference Device(SQUID).It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks.The surface roughness is about 36 nm.From the results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,and carbon is combined with oxygen in different forms under different supply-powers.The hysteresis loops indicate that the film is of soft magnetism.

  14. Microwave annealing effects on ZnO films deposited by atomic layer deposition

    Institute of Scientific and Technical Information of China (English)

    Zhao Shirui; Dong Yabin; Yu Mingyan; Guo Xiaolong; Xu Xinwei; Jing Yupeng; Xia Yang

    2014-01-01

    Zinc oxide thin films deposited on glass substrate at 150 ℃ by atomic layer deposition were annealed by the microwave method at temperatures below 500 ℃.The microwave annealing effects on the structural and luminescent properties of ZnO films have been investigated by X-ray diffraction and photoluminescence.The results show that the MWA process can increase the crystal quality of ZnO thin films with a lower annealing temperature than RTA and relatively decrease the green luminescence of ZnO films.The observed changes have demonstrated that MWA is a viable technique for improving the crystalline quality of ZnO thin film on glass.

  15. Nanostructuring and texturing of pulsed laser deposited hydroxyapatite thin films

    Science.gov (United States)

    Kim, Hyunbin; Catledge, Shane; Vohra, Yogesh; Camata, Renato; Lacefield, William

    2003-03-01

    Hydroxyapatite (HA) [Ca_10(PO_4)_6(OH)_2] is commonly deposited onto orthopedic and dental metallic implants to speed up bone formation around devices, allowing earlier stabilization in a patient. Pulsed laser deposition (PLD) is a suitable means of placing thin HA films on these implants because of its control over stoichiometry, crystallinity, and nanostructure. These characteristics determine the mechanical properties of the films that must be optimized to improve the performance of load-bearing implants and other devices that undergo bone insertion. We have used PLD to produce nanostructured and preferentially oriented HA films and evaluated their mechanical properties. Pure, highly crystalline HA films on Ti-6Al-4V substrates were obtained using a KrF excimer laser (248nm) with energy density of 4-8 J/cm^2 and deposition temperature of 500-700^rcC. Scanning electron and atomic force microscopies reveal that our careful manipulation of energy density and substrate temperature has led to films made up of HA grains in the nanometer scale. Broadening of x-ray diffraction peaks as a function of deposition temperature suggests it may be possible to control the film nanostructure to a great extent. X-ray diffraction also shows that as the laser energy density is increased in the 4-8 J/cm^2 range, the hexagonal HA films become preferentially oriented along the c-axis perpendicular to the substrate. Texture, nanostructure, and phase make-up all significantly influence the mechanical properties. We will discuss how each of these factors affects hardness and Young's modulus of the HA films as measured by nanoindentation.

  16. Glancing angle deposition of thin films engineering the nanoscale

    CERN Document Server

    Hawkeye, Matthew M; Brett, Michael J

    2014-01-01

    This book provides a highly practical treatment of GLAD technology, gathering existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: History and development of GLAD techniquesProperties and Characterization of GLAD fabricated filmsDesign and engineering of optical GLAD films including fabrication and testingPost-deposition processing and integrationDeposition systems for GLAD fabrication Also includes a patent survey of relevant literature and a survey of GLAD's wide range of material properties and diverse applications.

  17. Spray pyrolysis deposition of indium sulphide thin films

    International Nuclear Information System (INIS)

    In2S3 thin films were grown by the chemical spray pyrolysis (CSP) method using the pneumatic spray set-up and compressed air as a carrier gas. Aqueous solutions containing InCl3 and SC(NH2)2 at a molar ratio of In/S = 1/3 and 1/6 were deposited onto preheated glass sheets at substrate temperatures Ts = 205-410 oC. The obtained films were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM,) optical transmission spectra, X-ray photoelectron spectroscopy (XPS) and energy dispersive spectroscopy (EDS). According to XRD, thin films deposited at Ts = 205-365 oC were composed of the (0 0 12) orientated tetragonal β-In2S3 phase independent of the In/S ratio in the spray solution. Depositions performed at Ts = 410 oC led to the formation of the In2O3 phase, preferably when the 1/3 solution was sprayed. Post-deposition annealing in air indicated that oxidation of the sulphide phase has a minor role in the formation of In2O3 at temperatures up to 450 oC. In2S3 films grown at Ts below 365 oC exhibited transparency over 70% in the visible spectral region and Eg of 2.90-2.96 eV for direct and 2.15-2.30 eV for indirect transitions, respectively. Film thickness and chlorine content decreased with increasing deposition temperatures. The XPS study revealed that the In/S ratio in the spray solution had a significant influence on the content of oxygen (Me-O, BE = 530.0 eV) in the In2S3 films deposited in the temperature range of 205-365 oC. Both XPS and EDS studies confirmed that oxygen content in the films deposited using the solution with the In/S ratio of 1/6 was substantially lower than in the films deposited with the In/S ratio of 1/3.

  18. Pulsed laser deposition of anatase thin films on textile substrates

    Science.gov (United States)

    Krämer, André; Kunz, Clemens; Gräf, Stephan; Müller, Frank A.

    2015-10-01

    Pulsed laser deposition (PLD) is a highly versatile tool to prepare functional thin film coatings. In our study we utilised a Q-switched CO2 laser with a pulse duration τ ≈ 300 ns, a laser wavelength λ = 10.59 μm, a repetition frequency frep = 800 Hz and a peak power Ppeak = 15 kW to deposit crystalline anatase thin films on carbon fibre fabrics. For this purpose, preparatory experiments were performed on silicon substrates to optimise the anatase deposition conditions including the influence of different substrate temperatures and oxygen partial pressures. Processing parameters were then transferred to deposit anatase on carbon fibres. Scanning electron microscopy, X-ray diffraction analyses, Raman spectroscopy and tactile profilometry were used to characterise the samples and to reveal the formation of phase pure anatase without the occurrence of a secondary rutile phase. Methanol conversion test were used to prove the photocatalytic activity of the coated carbon fibres.

  19. Fabrication and characterization of vacuum deposited fluorescein thin films

    Energy Technology Data Exchange (ETDEWEB)

    Jalkanen, Pasi, E-mail: pasi.jalkanen@gmail.co [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kulju, Sampo, E-mail: sampo.j.kulju@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Arutyunov, Konstantin, E-mail: konstantin.arutyunov@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Antila, Liisa, E-mail: liisa.j.antila@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Myllyperkioe, Pasi, E-mail: pasi.myllyperkio@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Ihalainen, Teemu, E-mail: teemu.o.ihalainen@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kaeaeriaeinen, Tommi, E-mail: tommi.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Kaeaeriaeinen, Marja-Leena, E-mail: marja-leena.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Korppi-Tommola, Jouko, E-mail: jouko.korppi-tommola@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland)

    2011-03-31

    Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO{sub 2} coating. Surface topology, absorption and emission spectra of the films depend on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially forms islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO{sub 2} is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at {lambda} = 458 nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO{sub 2} is quenched due to the effective electron transfer to the semiconductor conduction band.

  20. Spray pyrolysis deposited tin selenide thin films for thermoelectric applications

    Energy Technology Data Exchange (ETDEWEB)

    Anwar, Sharmistha; Gowthamaraju, S.; Mishra, B.K.; Singh, S.K.; Shahid, Anwar, E-mail: shahidanwr@gmail.com

    2015-03-01

    Tin selenide thin films were prepared by spray pyrolysis technique using tin (II) chloride and selenourea as a precursor compounds using Se:Sn atomic ratio of 1:1 in the starting solution onto glass substrates. Deposition process was carried out in the substrate temperature range of 250 °C–400 °C using 1 ml/min flow rate. The films were investigated using X-ray diffraction, field emission scanning electron microscopy, Raman spectroscopy, optical absorption and thermoelectric studies. The X-ray diffraction patterns suggest that the major phase is hexagonal-SnSe{sub 2} was present when the deposition was carried out in 275–375 °C temperature range, while for the films deposited in the below and above to this range, Sn and Se precipitates into some impure and mixed phase. Raman scattering analysis allowed the assignment of peaks at ∼180 cm{sup −1} to the hexagonal-SnSe{sub 2} phase. The optical absorption study shows that the direct band gap of the film decreases with increase in substrate temperature and increasing crystallite size. The thermo-electrical measurements have shown n-type conductivity in as deposited films and the magnitude of thermo EMF for films has been found to be increasing with increasing deposition temperature, except for 350 °C sample. 350 °C deposited samples shows enhance thermoelectric value as compared to other samples. Thermoelectric study reveal that although sample deposited between 275 °C and 375 °C are structurally same but 350 °C sample is thermoelectrically best. - Highlights: • Influence of substrate temperature on the deposition of SnSe has been shown. • Seebeck measurements at 275°C–375 °C confirms n-type conductivity. • Higher seebeck coefficient has been observed at 350 °C deposited film. • Decrease in band gap was observed on increasing Tsub and size of the crystallites.

  1. Experiment and equipment of depositing diamond films with CVD system

    International Nuclear Information System (INIS)

    CVD (chemical vapor deposition) emerged in recent years is a new technique for thin film deposition, which play a key role in development of modern physics. It is important to predominate the principle and technology of CVD for studying modern physics. In this paper, a suit of CVD experimental equipment for teaching in college physics is presented, which has simple design and low cost. The good result was gained in past teaching practices

  2. Alternating deposition films of a polymer and dendrimers bearing diphenylanthracene

    Institute of Scientific and Technical Information of China (English)

    SUN Jing; WANG Liyan; GAO Jian; YU Xi; WANG Zhiqiang

    2005-01-01

    Two generations of carboxyl-terminated poly (aryl ether) dendrimers bearing 9,10-diphenylanthracene cores are designed and synthesized. Alternating deposition of two dendrimers and poly(4-vinylpyridine) is studied with UV-Vis spectroscopy, FT-IR spectroscopy and atomic force microscopy. Experimental results indicate that this method to introduce chromophore into multilayer film can effectively prevent desorption of dye molecule. Moreover, it is found that dendrimer can inhibit the aggregation of fluorophore in film using fluorescence spectroscopy. Increase of dendrimer's generation can enhance fluorescence intensity of each fluorophore. This provides a new approach to design luminescent thin film.

  3. Impact toughness of tungsten films deposited on martensite stainless steel

    Institute of Scientific and Technical Information of China (English)

    HUANG Ning-kang; YANG Bin; WANG De-zhi

    2005-01-01

    Tungsten films were deposited on stainless steel Charpy specimens by magnetron sputtering followed by electron beam heat treatment. Charpy impact tests and scanning electron microscopy were used to investigate the ductile-brittle transition behavior of the specimens. With decreasing test temperature the fracture mode was transformed from ductile to brittle for both kinds of specimens with and without W films. The data of the crack initiation energy, crack propagation energy, impact absorbing energy, fracture time and deflection as well as the fracture morphologies at test temperature of -70 ℃ show that W films can improve the impact toughness of stainless steel.

  4. Morphological Study Of Palladium Thin Films Deposited By Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Salcedo, K L; Rodriguez, C A [Grupo Plasma Laser y Aplicaciones, Ingenieria Fisica, Universidad Tecnologica de Pereira (Colombia); Perez, F A [WNANO, West Virginia University (United States); Riascos, H [Grupo Plasma Laser y Aplicaciones, Departamento de Fisica, Universidad Tecnologica de Pereira (Colombia)

    2011-01-01

    This paper presents a morphological analysis of thin films of palladium (Pd) deposited on a substrate of sapphire (Al{sub 2}O{sub 3}) at a constant pressure of 3.5 mbar at different substrate temperatures (473 K, 523 K and 573 K). The films were morphologically characterized by means of an Atomic Force Microscopy (AFM); finding a relation between the roughness and the temperature. A morphological analysis of the samples through AFM was carried out and the roughness was measured by simulating the X-ray reflectivity curve using GenX software. A direct relation between the experimental and simulation data of the Palladium thin films was found.

  5. The Effect of Deposition Time on Textured Magnesium Diboride Thick Films Fabricated by Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    W. G. Mutia

    2004-12-01

    Full Text Available MgB2 powders suspended in ethanol were electrophoretically deposited on high-purity molybdenum substrates having dimensions of 1 x 0.3 x 0.01 cm. The said substrate was set as the cathode and was placed 0.5 cm away from a graphite rod anode. A current density of ~0.02 mA/cm2 and a voltage of 600 V were applied. The effect of deposition time was studied by varying it as follows: 15 s, 30 s, 1 min, and 2 min. Heat treatment at 950 oC for 3 h was done after deposition. MgB2 thick films were successfully fabricated for the deposition carried out for 2 min. Deposition times less than 2 min resulted in insufficient deposited powder; hence formation of MgB2 was not facilitated. Films deposited at 15 and 30 s have good surface characteristics, wherein no microcracks were present. X-ray diffraction and surface image analysis reveal that the deposited films have a preferred orientation along the (10l direction.

  6. Coaxial carbon plasma gun deposition of amorphous carbon films

    International Nuclear Information System (INIS)

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented

  7. Coaxial carbon plasma gun deposition of amorphous carbon films

    Science.gov (United States)

    Sater, D. M.; Gulino, D. A.; Rutledge, S. K.

    1984-01-01

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented.

  8. Deposition and characterisation of epitaxial oxide thin films for SOFCs

    KAUST Repository

    Santiso, José

    2010-10-24

    This paper reviews the recent advances in the use of thin films, mostly epitaxial, for fundamental studies of materials for solid oxide fuel cell (SOFC) applications. These studies include the influence of film microstructure, crystal orientation and strain in oxide ionic conducting materials used as electrolytes, such as fluorites, and in mixed ionic and electronic conducting materials used as electrodes, typically oxides with perovskite or perovskite-related layered structures. The recent effort towards the enhancement of the electrochemical performance of SOFC materials through the deposition of artificial film heterostructures is also presented. These thin films have been engineered at a nanoscale level, such as the case of epitaxial multilayers or nanocomposite cermet materials. The recent progress in the implementation of thin films in SOFC devices is also reported. © 2010 Springer-Verlag.

  9. CHEMICALLY DEPOSITED SILVER FILM USED AS A SERS-ACTIVE OVER COATING LAYER FOR POLYMER FILM

    Institute of Scientific and Technical Information of China (English)

    Xiao-ning Liu; Gi Xue; Yun Lu; Jun Zhang; Fen-ting Li; Chen-chen Xue; Stephen Z.D. Cheng

    2001-01-01

    When colloidal silver particles were chemically deposited onto polymer film as an over-coating layer, surfaceenhanced Raman scattering (SERS) spectra could be collected for the surface analysis. SERS measurements of liquid crystal film were successfully performed without disturbing the surface morphology.

  10. Deposition of polymer films in low pressure reactive plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Biederman, H.

    1981-12-11

    Sputtering and plasma polymerization have found wide application as deposition techniques and have been extensively studied. R.f. sputtering of plastics, in particular of polytetrafluoroethylene, are discussed in the first part of this paper. In the second part, the general concept of plasma polymerization is considered and some examples of applications of plasma-polymerized films are presented. Special attention is paid to fluorocarbon and fluorochlorocarbon films. It has been suggested that these films could be used in thin film capacitors or as passivating layers for integrated circuits. In the optical field some of these films have been used as convenient moisture-resistant, protective and antireflecting coatings. Their mechanical properties have also been examined with the intention of using them for reducing surface friction. More recently some metals have been incorporated into fluorocarbon films to obtain layers with novel properties. Experiments in which films were prepared by the plasma polymerization of certain Freons are described. Some electrical and optical properties of these films are presented. High dielectric losses were obtained in a metal/film/metal sandwich configuration and the possible influence of ambient atmospheric effects on these measurements is discussed.

  11. [The impact of ZnS/CdS composite window layer on the quantun efficiency of CdTe solar cell in short wavelength].

    Science.gov (United States)

    Zhang, Li-xiang; Feng, Liang-huan; Wang, Wen-wu; Xu, Hang; Wu, Li-li; Zhang, Jing-quan; Li, Wei; Zeng, Guang-gen

    2015-02-01

    ZnS/CdS composite window layer was prepared by magnetron sputtering method and then applied to CdTe solar cell. The morphology and structure of films were measured. The data of I-V in light and the quantum efficiency of CdTe solar cells with different window layers were also measured. The effect of ZnS films prepared in different conditions on the performance of CdTe solar cells was researched. The effects of both CdS thickness and ZnS/CdS composite layer on the transmission in short wavelength were studied. Particularly, the quantum efficiency of CdTe solar cells with ZnS/CdS window layer was measured. The results show as follows. With the thickness of CdS window layer reducing from 100 to 50 nm, the transmission increase 18.3% averagely in short wavelength and the quantum efficiency of CdTe solar cells increase 27.6% averagely. The grain size of ZnS prepared in 250 degrees C is smaller than prepared at room temperature. The performance of CdTe solar cells with ZnS/CdS window layer is much better if ZnS deposited at 250 degrees C. This indicates grain size has some effect on the electron transportation. When the CdS holds the same thickness, the transmission of ZnS/CdS window layer was improved about 2% in short wavelength compared with CdS window layer. The quantum efficiency of CdTe solar cells with ZnS/CdS window layer was also improved about 2% in short wavelength compared with that based on CdS window layer. These indicate ZnS/CdS composite window layer can increase the photon transmission in short wavelength so that more photons can be absorbed by the absorbent layer of CdTe solar cells. PMID:25970885

  12. Structural, electrical and optical properties of copper selenide thin films deposited by chemical bath deposition technique

    International Nuclear Information System (INIS)

    A low cost chemical bath deposition (CBD) technique has been used for the preparation of Cu2-xSe thin films on glass substrates. Structural, electrical and optical properties of these films were investigated. X-ray diffraction (XRD) study of the Cu2-xSe films annealed at 523K suggests a cubic structure with a lattice constant of 5.697A. Chemical composition was investigated by X-ray photoelectron spectroscopy (XPS). It reveals that absorbed oxygen in the film decreases remarkably on annealing above 423K. The Cu/Se ratio was observed to be the same in as-deposited and annealed films. Both as- deposited and annealed films show very low resistivity in the range of (0.04- 0.15) x 10-5 Ω-m. Transmittance and Reflectance were found in the range of 5-50% and 2-20% respectively. Optical absorption of the films results from free carrier absorption in the near infrared region with absorption coefficient of ∼108 m-1. The band gap for direct transition, Eg.dir varies in the range of 2.0-2.3eV and that for indirect transition Eg.indir is in the range of 1.25-1.5eV.1. (author)

  13. The effects of high temperature processing on the structural and optical properties of oxygenated CdS window layers in CdTe solar cells

    International Nuclear Information System (INIS)

    High efficiency CdTe solar cells typically use oxygenated CdS (CdS:O) window layers. We synthesize CdS:O window layers at room temperature (RT) and 270 °C using reactive sputtering. The band gaps of CdS:O layers deposited at RT increase when O2/(O2 + Ar) ratios in the deposition chamber increase. On the other hand, the band gaps of CdS:O layers deposited at 270 °C decrease as the O2/(O2 + Ar) ratios increase. Interestingly, however, our high temperature closed-space sublimation (CSS) processed CdTe solar cells using CdS:O window layers deposited at RT and 270 °C exhibit very similar cell performance, including similar short-circuit current densities. To understand the underlying reasons, CdS:O thin films deposited at RT and 270 °C are annealed at temperatures that simulate the CSS process of CdTe deposition. X-ray diffraction, atomic force microscopy, and UV-visible light absorption spectroscopy characterization of the annealed films reveals that the CdS:O films deposited at RT undergo grain regrowth and/or crystallization and exhibit reduced band gaps after the annealing. Our results suggest that CdS:O thin films deposited at RT and 270 °C should exhibit similar optical properties after the deposition of CdTe layers, explaining the similar cell performance.

  14. CdS: Characterization and recent advances in CdTe solar cell performance

    Energy Technology Data Exchange (ETDEWEB)

    Ferekides, C.; Marinskiy, D.; Morel, D.L. [Univ. of South Florida, FL (United States)

    1997-12-31

    Cadmium sulfide (CdS) films deposited by chemical bath deposition (CBD) have been used for the fabrication of high efficiency CdTe and CuIn{sub 1{minus}x}Ga{sub x}Se{sub 2} thin film solar cells. An attractive alternative deposition technology with manufacturing advantages over the CBD is the close spaced sublimation (CSS). In this work CdTe/CdS solar cells prepared entirely by the CSS process exhibited 15.0% efficiencies under global AM1.5 conditions as verified at the National Renewable Energy Laboratory. This paper reports on studies carried out on as deposited and heat treated CSS CdS films and all CSS CdTe/CdS solar cells using photoluminescence, x-ray diffraction, and I-V-T measurements.

  15. Fundamental Mechanisms of Roughening and Smoothing During Thin Film Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Headrick, Randall [Univ. of Vermont, Burlington, VT (United States)

    2016-03-18

    In this research program, we have explored the fundamental limits for thin film deposition in both crystalline and amorphous (i.e. non-crystalline) materials systems. For vacuum-based physical deposition processes such as sputter deposition, the background gas pressure of the inert gas (usually argon) used as the process gas has been found to be a key variable. Both a roughness transition and stress transition as a function of pressure have been linked to a common mechanism involving collisions of energetic particles from the deposition source with the process inert gas. As energetic particles collide with gas molecules in the deposition process they lose their energy rapidly if the pressure (and background gas density) is above a critical value. Both roughness and stress limit important properties of thin films for applications. In the area of epitaxial growth we have also discovered a related effect; there is a critical pressure below which highly crystalline layers grow in a layer-by-layer mode. This effect is also though to be due to energetic particle thermalization and scattering. Several other important effects such as the observation of coalescence dominated growth has been observed. This mode can be likened to the behavior of two-dimensional water droplets on the hood of a car during a rain storm; as the droplets grow and touch each other they tend to coalesce rapidly into new larger circular puddles, and this process proceeds exponentially as larger puddles overtake smaller ones and also merge with other large puddles. This discovery will enable more accurate simulations and modeling of epitaxial growth processes. We have also observed that epitaxial films undergo a roughening transition as a function of thickness, which is attributed to strain induced by the crystalline lattice mismatch with the substrate crystal. In addition, we have studied another physical deposition process called pulsed laser deposition. It differs from sputter deposition due to the

  16. Flame spray pyrolysis synthesis and aerosol deposition of nanoparticle films

    DEFF Research Database (Denmark)

    Tricoli, Antonio; Elmøe, Tobias Dokkedal

    2012-01-01

    The assembly of nanoparticle films by flame spray pyrolysis (FSP) synthesis and deposition on temperature‐controlled substrates (323–723 K) was investigated for several application‐relevant conditions. An exemplary SnO2 nanoparticle aerosol was generated by FSP and its properties (e.g., particle...

  17. Chemical Vapor Deposition of Aluminum Oxide Thin Films

    Science.gov (United States)

    Vohs, Jason K.; Bentz, Amy; Eleamos, Krystal; Poole, John; Fahlman, Bradley D.

    2010-01-01

    Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for many undergraduate chemistry laboratories, especially at smaller institutions. In an effort to…

  18. Hardening of smooth pulsed laser deposited PMMA films by heating

    Science.gov (United States)

    Fuchs, Britta; Schlenkrich, Felix; Seyffarth, Susanne; Meschede, Andreas; Rotzoll, Robert; Vana, Philipp; Großmann, Peter; Mann, Klaus; Krebs, Hans-Ulrich

    2010-03-01

    Smooth poly(methyl methacrylate) (PMMA) films without any droplets were pulsed laser deposited at a wavelength of 248 nm and a laser fluence of 125 mJ/cm2. After deposition at room temperature, the films possess low universal hardness of only 3 N/mm2. Thermal treatments up to 200°C, either during deposition or afterwards, lead to film hardening up to values of 200 N/mm2. Using a combination of complementary methods, two main mechanisms could be made responsible for this temperature induced hardening effect well above the glass transition temperature of 102°C. The first process is induced by the evaporation of chain fragments and low molecular mass material, which are present in the film due to the ablation process, leading to an increase of the average molecular mass and thus to hardening. The second mechanism can be seen in partial cross-linking of the polymer film as soon as chain scission occurs at higher temperatures and the mobility and reactivity of the polymer material is high enough.

  19. Deposition and characterization of vacuum deposited aluminum films on Kapton laminates

    Energy Technology Data Exchange (ETDEWEB)

    Sherman, D.M.

    1978-07-01

    A process has been developed for the vacuum deposition by electron beam evaporation of high quality aluminum films 10 ..mu..m thick on domed three-layer laminated substrates consisting of Kapton/Pyralux/Kapton/Pyralux/Aluminum (Du Pont Corporation). Thermogravimetric analysis and mass spectrometry of the substrate materials and in-process residual gas analysis were used to determine the outgassing characteristics of the substrate laminate and to aid in the development of suitable thermal processing. The laminated substrates required bakeouts both at atmosphere and in high vacuum prior to deposition to permit evaporation at a pressure of 0.1 mPa (1 x 10/sup -6/ torr). Film properties that were obtained were a thickness uniformity across a 200 mm diameter part in the 1 percent range, a resistivity near that of bulk pure aluminum, a smooth and shiny film surface, and adequate film adhesion.

  20. Low resistance polycrystalline diamond thin films deposited by hot filament chemical vapour deposition

    Indian Academy of Sciences (India)

    Mahtab Ullah; Ejaz Ahmed; Abdelbary Elhissi; Waqar Ahmed

    2014-05-01

    Polycrystalline diamond thin films with outgrowing diamond (OGD) grains were deposited onto silicon wafers using a hydrocarbon gas (CH4) highly diluted with H2 at low pressure in a hot filament chemical vapour deposition (HFCVD) reactor with a range of gas flow rates. X-ray diffraction (XRD) and SEM showed polycrystalline diamond structure with a random orientation. Polycrystalline diamond films with various textures were grown and (111) facets were dominant with sharp grain boundaries. Outgrowth was observed in flowerish character at high gas flow rates. Isolated single crystals with little openings appeared at various stages at low gas flow rates. Thus, changing gas flow rates had a beneficial influence on the grain size, growth rate and electrical resistivity. CVD diamond films gave an excellent performance for medium film thickness with relatively low electrical resistivity and making them potentially useful in many industrial applications.

  1. Degradation and capacitance: voltage hysteresis in CdTe devices

    Science.gov (United States)

    Albin, D. S.; Dhere, R. G.; Glynn, S. C.; del Cueto, J. A.; Metzger, W. K.

    2009-08-01

    CdS/CdTe photovoltaic solar cells were made on two different transparent conducting oxide (TCO) structures in order to identify differences in fabrication, performance, and reliability. In one set of cells, chemical vapor deposition (CVD) was used to deposit a bi-layer TCO on Corning 7059 borosilicate glass consisting of a F-doped, conductive tin-oxide (cSnO2) layer capped by an insulating (undoped), buffer (iSnO2) layer. In the other set, a more advanced bi-layer structure consisting of sputtered cadmium stannate (Cd2SnO4; CTO) as the conducting layer and zinc stannate (Zn2SnO4; ZTO) as the buffer layer was used. CTO/ZTO substrates yielded higher performance devices however performance uniformity was worse due to possible strain effects associated with TCO layer fabrication. Cells using the SnO2-based structure were only slightly lower in performance, but exhibited considerably greater performance uniformity. When subjected to accelerated lifetime testing (ALT) at 85 - 100 °C under 1-sun illumination and open-circuit bias, more degradation was observed in CdTe cells deposited on the CTO/ZTO substrates. Considerable C-V hysteresis, defined as the depletion width difference between reverse and forward direction scans, was observed in all Cu-doped CdTe cells. These same effects can also be observed in thin-film modules. Hysteresis was observed to increase with increasing stress and degradation. The mechanism for hysteresis is discussed in terms of both an ionic-drift model and one involving majority carrier emission in the space-charge region (SCR). The increased generation of hysteresis observed in CdTe cells deposited on CTO/ZTO substrates suggests potential decomposition of these latter oxides when subjected to stress testing.

  2. Deposition of SiC thin films by PECVD

    CERN Document Server

    Cho, N I; Kim, C K

    1999-01-01

    The SiC films were deposited on Si substrate by the decomposition of CH sub 3 SiCl sub 3 (methylthrichlorosilane) molecules in a high frequency discharge field. From the Raman spectra, it is conjectured that the deposited film are formed into the polycrystalline structure. The photon absorption measurement reveal that the band gap of the electron energy state are to be 2.4 eV for SiC, and 2.6 eV for Si sub 0 sub . sub 4 C sub 0 sub . sub 6 , respectively. In the high power density regime, methyl-radicals decompose easily and increases the carbon concentration in plasma and result in the growing films.

  3. Light-assisted deposition of CdS thin films

    Science.gov (United States)

    Bacaksiz, E.; Novruzov, V.; Karal, H.; Yanmaz, E.; Altunbas, M.; Kopya, A. I.

    2001-11-01

    The effects of white light illumination during the deposition of CdS thin films in a quasi-closed volume on the structural, photoelectrical and optical properties are investigated. The films were highly c-axis oriented with an increasing intensity of (002) reflection as the illumination increases. The room temperature resistivity values of the CdS films decreased in the range of 107-104 Ω cm. The photosensitivity in the fundamental absorption region and the transparency in the transmission region considerably increased as the illumination increased. Under 100 mW cm-2 insolation, the efficiencies of the CdS/CdTe solar cells based on CdS window materials which were deposited: (1) in the dark; and (2) under an illumination of 150 mW cm-2 were found to be 1.8% and 7.3%, respectively.

  4. Bath parameter dependence of chemically deposited Copper Selenide thin film

    International Nuclear Information System (INIS)

    In this article, a low cost chemical bath deposition (CBD) technique has been used for the preparation Of Cu2-xSe thin films on to glass substrate. Different thin fms (0.2-0.6/μm) were prepared by adjusting the bath parameter like concentration of ammonia, deposition time, temperature of the solution, and the ratios of the mixing composition between copper and selenium in the reaction bath. From these studies, it reveals that at low concentration of ammonia or TEA, the terminal thicknesses of the films are less, which gradually increases with the increase of concentrations and then drop down at still higher concentrations. It has been found that completing the Cu2+ ions with EA first, and then addition of ammonia yields better results than the reverse process. The film thickness increases with the decrease of value x of Cu2-xSe. (author)

  5. Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Besland, M.P. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France)]. E-mail: Marie-Paule.Besland@cnrs-imn.fr; Djani-ait Aissa, H. [Division milieux Ionises et lasers, Centre de Developpement des Technologies Avancees CDTA, Baba Hassen Alger, Algerie (Algeria); Barroy, P.R.J. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France); Lafane, S. [Division milieux Ionises et lasers, Centre de Developpement des Technologies Avancees CDTA, Baba Hassen Alger, Algerie (Algeria); Tessier, P.Y. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France); Angleraud, B. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France); Richard-Plouet, M. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France); Brohan, L. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France); Djouadi, M.A. [Institut des Materiaux Jean Rouxel, Universite de Nantes, UMR CNRS 6502, 2 rue de la Houssiniere, B.P. 32229, 44322, Nantes cedex 3 (France)

    2006-01-20

    Bi{sub 4-x}La {sub x}Ti{sub 3}O{sub 12} (BLT {sub x}) (x = 0 to 1) thin films were grown on silicon (100) and platinized substrates Pt/TiO{sub 2}/SiO{sub 2}/Si using RF diode sputtering, magnetron sputtering and pulsed laser deposition (PLD). Stoichiometric home-synthesized targets were used. Reactive sputtering was investigated in argon/oxygen gas mixture, with a pressure ranging from 0.33 to 10 Pa without heating the substrate. PLD was investigated in pure oxygen, at a chamber pressure of 20 Pa for a substrate temperature of 400-440 deg. C. Comparative structural, chemical, optical and morphological characterizations of BLT thin films have been performed by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X-Ray Photoelectron Spectroscopy (XPS), Spectro-ellipsometric measurements (SE) and Atomic Force Microscopy (AFM). Both sputtering techniques allow to obtain uniform films with thickness ranging from 200 to 1000 nm and chemical composition varying from (Bi,La){sub 2} Ti{sub 3} O{sub 12} to (Bi,La){sub 4.5}Ti{sub 3}O{sub 12}, depending on deposition pressure and RF power. In addition, BLT films deposited by magnetron sputtering, at a pressure deposition ranging from 1.1 to 5 Pa, were well-crystallized after a post-deposition annealing at 650 deg. C in oxygen. They exhibit a refractive index and optical band gap of 2.7 and 3.15 eV, respectively. Regarding PLD, single phase and well-crystallized, 100-200 nm thick BLT films with a stoichiometric (Bi,La){sub 4}Ti{sub 3}O{sub 12} chemical composition were obtained, exhibiting in addition a preferential orientation along (200). It is worth noting that BLT films deposited by magnetron sputtering are as well-crystallized than PLD ones.

  6. Comparison of lanthanum substituted bismuth titanate (BLT) thin films deposited by sputtering and pulsed laser deposition

    International Nuclear Information System (INIS)

    Bi4-xLa xTi3O12 (BLT x) (x = 0 to 1) thin films were grown on silicon (100) and platinized substrates Pt/TiO2/SiO2/Si using RF diode sputtering, magnetron sputtering and pulsed laser deposition (PLD). Stoichiometric home-synthesized targets were used. Reactive sputtering was investigated in argon/oxygen gas mixture, with a pressure ranging from 0.33 to 10 Pa without heating the substrate. PLD was investigated in pure oxygen, at a chamber pressure of 20 Pa for a substrate temperature of 400-440 deg. C. Comparative structural, chemical, optical and morphological characterizations of BLT thin films have been performed by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS), X-Ray Photoelectron Spectroscopy (XPS), Spectro-ellipsometric measurements (SE) and Atomic Force Microscopy (AFM). Both sputtering techniques allow to obtain uniform films with thickness ranging from 200 to 1000 nm and chemical composition varying from (Bi,La)2 Ti3 O12 to (Bi,La)4.5Ti3O12, depending on deposition pressure and RF power. In addition, BLT films deposited by magnetron sputtering, at a pressure deposition ranging from 1.1 to 5 Pa, were well-crystallized after a post-deposition annealing at 650 deg. C in oxygen. They exhibit a refractive index and optical band gap of 2.7 and 3.15 eV, respectively. Regarding PLD, single phase and well-crystallized, 100-200 nm thick BLT films with a stoichiometric (Bi,La)4Ti3O12 chemical composition were obtained, exhibiting in addition a preferential orientation along (200). It is worth noting that BLT films deposited by magnetron sputtering are as well-crystallized than PLD ones

  7. Pulsed laser deposition of nano-glassy carbon films

    Energy Technology Data Exchange (ETDEWEB)

    Ossi, P.M. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy)]. E-mail: paolo.ossi@polimi.it; Bottani, C.E. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy); Miotello, A. [Dip. Fisica, Universita di Trento, 38050 Povo (TN) (Italy)

    2005-07-30

    Carbon films have been deposited at room temperature on (1 0 0) Si substrates by pulsed laser ablation (PLA) from a highly oriented pyrolitic graphite source. Changing the laser power density from 8.5 to 19 MW mm{sup -2} and using various ambient atmospheres (helium, argon from 0.6 Pa to 2 kPa), nano-sized cluster-assembled films were obtained. Scanning electron microscopy shows that the film morphology, changes with increasing ambient gas pressure. We observed in the sequence: dense columns, node-like morphology, platelets (only in argon) and an open dendritic structure. By atomic force microscopy, on representative films, we evaluated the size distribution and relative abundancy of aggregates of carbon clusters, as well as film roughness. Raman spectroscopy shows that all the films are sp{sup 2} coordinated, structurally disordered and belong to the family of carbon nano-glasses. The estimated film coherence length gives an average size of about 5 nm for the agglomerated carbon clusters in the films. The average number of carbon atoms per cluster depends on ambient gas pressure, but is nearly independent of laser intensity.

  8. In situ measurement of conductivity during nanocomposite film deposition

    Science.gov (United States)

    Blattmann, Christoph O.; Pratsinis, Sotiris E.

    2016-05-01

    Flexible and electrically conductive nanocomposite films are essential for small, portable and even implantable electronic devices. Typically, such film synthesis and conductivity measurement are carried out sequentially. As a result, optimization of filler loading and size/morphology characteristics with respect to film conductivity is rather tedious and costly. Here, freshly-made Ag nanoparticles (nanosilver) are made by scalable flame aerosol technology and directly deposited onto polymeric (polystyrene and poly(methyl methacrylate)) films during which the resistance of the resulting nanocomposite is measured in situ. The formation and gas-phase growth of such flame-made nanosilver, just before incorporation onto the polymer film, is measured by thermophoretic sampling and microscopy. Monitoring the nanocomposite resistance in situ reveals the onset of conductive network formation by the deposited nanosilver growth and sinternecking. The in situ measurement is much faster and more accurate than conventional ex situ four-point resistance measurements since an electrically percolating network is detected upon its formation by the in situ technique. Nevertheless, general resistance trends with respect to filler loading and host polymer composition are consistent for both in situ and ex situ measurements. The time lag for the onset of a conductive network (i.e., percolation) depends linearly on the glass transition temperature (Tg) of the host polymer. This is attributed to the increased nanoparticle-polymer interaction with decreasing Tg. Proper selection of the host polymer in combination with in situ resistance monitoring therefore enable the optimal preparation of conductive nanocomposite films.

  9. Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Munoz-Martin, D.; Fernandez-Navarro, J.M. [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Gonzalo, J., E-mail: j.gonzalo@io.cfmac.csic.es [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Jose, G.; Jha, A. [Institute for Materials Research, University of Leeds, Clarendon Road, Leeds LS2 9JT (United Kingdom); Fierro, J.L.G. [Instituto de Catalisis y Petroleoquimica (CSIC), Marie Curie s/n, 28049 Cantoblanco (Spain); Domingo, C. [Instituto de Estructura de la Materia (CSIC), Serrano 121, 28006 Madrid (Spain); Garcia-Lopez, J. [Centro Nacional de Aceleradores, P. Tecnologico ' Cartuja 93' , 41092 Sevilla (Spain)

    2011-10-31

    Tellurite (TeO{sub 2}-TiO{sub 2}-Nb{sub 2}O{sub 5}) thin film glasses have been produced by pulsed laser deposition at room temperature at laser energy densities in the range of 0.8-1.5 J/cm{sup 2} and oxygen pressures in the range of 3-11 Pa. The oxygen concentration in the films increases with laser energy density to reach values very close to that of the bulk glass at 1.5 J/cm{sup 2}, while films prepared at 1.5 J/cm{sup 2} and pressures above 5 Pa show oxygen concentration in excess of 10% comparing to the glass. X-ray photoelectron spectroscopy shows the presence of elementary Te in films deposited at O{sub 2} pressures {<=} 5 Pa that is not detected at higher pressures, while analysis of Raman spectra of the samples suggests a progressive substitution of TeO{sub 3} trigonal pyramids by TeO{sub 4} trigonal bipyramids in the films when increasing their oxygen content. Spectroscopic ellipsometry analysis combined with Cauchy and effective medium modeling demonstrates the influence of these compositional and structural modifications on the optical response of the films. Since the oxygen content determines their optical response through the structural modifications induced in the films, those can be effectively controlled by tuning the deposition conditions, and films having large n (2.08) and reduced k (< 10{sup -4}) at 1.5 {mu}m have been produced using the optimum deposition conditions.

  10. Enhanced performance of CdS/CdTe thin-film devices through temperature profiling techniques applied to close-spaced sublimation deposition

    Energy Technology Data Exchange (ETDEWEB)

    Xiaonan Li; Sheldon, P.; Moutinho, H.; Matson, R. [National Renewable Energy Lab., Golden, CO (United States)

    1996-05-01

    The authors describe a methodology developed and applied to the close-spaced sublimation technique for thin-film CdTe deposition. The developed temperature profiles consisted of three discrete temperature segments, which the authors called the nucleation, plugging, and annealing temperatures. They have demonstrated that these temperature profiles can be used to grow large-grain material, plug pinholes, and improve CdS/CdTe photovoltaic device performance by about 15%. The improved material and device properties have been obtained while maintaining deposition temperatures compatible with commercially available substrates. This temperature profiling technique can be easily applied to a manufacturing environment by adjusting the temperature as a function of substrate position instead of time.

  11. Vacuum deposition onto webs, films and foils

    CERN Document Server

    Bishop, Charles A

    2011-01-01

    Roll-to-roll vacuum deposition is the technology that applies an even coating to a flexible material that can be held on a roll and provides a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces, such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging (e.g. snack packets). Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology: solar energy products are moving from rigid panels onto flexible substrates, which are cheaper and more versatile; in a similar way, electronic circuit 'boards' can be produced on a flexible polymer, creating a new range of 'flexible electronics' products; and, flexible displays are another area of new technology in vacuum coating, with flexible display panels and light sources emerging. Charles Bishop has written this book to meet the need he identified, as a t...

  12. Interplay between the deposition mode and microstructure in electrochemically deposited Cu thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kremmer, K. [Institute of Materials Science, TU Bergakademie Freiberg, Gustav-Zeuner-Str. 5, D-09599 Freiberg (Germany); Yezerska, O. [Fraunhofer Institute for Manufacturing Technology and Applied Materials Research, Wiener Str. 12, D-28359 Bremen (Germany); Schreiber, G. [Institute of Materials Science, TU Bergakademie Freiberg, Gustav-Zeuner-Str. 5, D-09599 Freiberg (Germany); Masimov, M. [Institute of Materials Science, TU Bergakademie Freiberg, Gustav-Zeuner-Str. 5, D-09599 Freiberg (Germany); Klemm, V. [Institute of Materials Science, TU Bergakademie Freiberg, Gustav-Zeuner-Str. 5, D-09599 Freiberg (Germany); Schneider, M. [Fraunhofer Institute for Manufacturing Technology and Applied Materials Research, Wiener Str. 12, D-28359 Bremen (Germany); Rafaja, D. [Institute of Materials Science, TU Bergakademie Freiberg, Gustav-Zeuner-Str. 5, D-09599 Freiberg (Germany)]. E-mail: rafaja@ww.tu-freiberg.de

    2007-06-13

    The influence of the electrochemical potential and the deposition mode on the preferred orientation and morphology of crystallites and on the microstrain in electrochemically deposited copper thin films was investigated using a combination of cyclic voltammetry, chronoamperometry, X-ray diffraction, SEM and the diffraction of backscattered electrons. With increasing negative electrochemical potential, the deposition mode changed from the charge transfer controlled one to the diffusion controlled one. At the highest electrochemical potentials, copper deposition was accompanied by hydrogen reduction. In potentiostatically deposited thin films, the preferred orientation of crystallites changed from {l_brace}111{r_brace} in the charge transfer controlled deposition mode to {l_brace}110{r_brace} in the diffusion controlled one. The increase of the electrochemical potential in the charge transport controlled deposition mode caused an increase of the dislocation density. The increasing electrochemical potential in the diffusion controlled mode led to a decrease of the dislocation density. The copper deposition, which was accompanied by the hydrogen reduction, produced needle-like crystallites with the {l_brace}100{r_brace} texture and with the lowest dislocation density.

  13. Reactive sputtering deposition of SiO2 thin films

    Directory of Open Access Journals (Sweden)

    IVAN RADOVIC

    2008-01-01

    Full Text Available SiO2 layers were deposited in a UHV chamber by 1 keV Ar+ ion sputtering from a high purity silicon target, using different values of the oxygen partial pressure (5×10-6–2×10-4 mbar and of the ion beam current on the target (1.67–6.85 mA. The argon partial pressure during operation of the ion gun was 1×10-3 mbar. The substrate temperature was held at 550 °C and the films were deposited to a thickness of 12.5–150 nm, at a rate from 0.0018–0.035 nm s-1. Structural characterization of the deposited thin films was performed by Rutherford backscattering spectrometry (RBS analysis. Reactive sputtering was proved to be efficient for the deposition of silica at 550 °C, an oxygen partial pressure of 2×10-4 mbar (ion beam current on the target of 5 mA or, at a lower deposition rate, ion beam current of 1.67 mA and an oxygen partial pressure of 6×10-5 mbar. One aspect of these investigations was to study the consumption of oxygen from the gas cylinder, which was found to be lower for higher deposition rates.

  14. Influence of deposition duration on CdS/CdTe solar cell performance

    International Nuclear Information System (INIS)

    The photo-electrical properties of thin film CdS/CdTe HJ were studied at their illumination with the integral light through the wide band gap component CdS (Eg = 2.42 eV). The CdTe layer thickness influence (according the time of deposition of CdTe layers) was studied on the photoelectrical parameters as well. Influence of the time deposition of the CdTe layer on the quantum efficiency was also studied. Quantum efficiency decreases with CdTe thickness increase. The photosensitivity covers the wavelength range from 0.50 mm to 0.86 mm for all cells. The most efficient carrier generation and collection is for the structure with CdTe layer time of deposition of 3.5 min. With increase of CdTe layer thickness a change in the form of quantum efficiency spectra can be observed. In the long wavelength region a maximum which indicates the high contribution CdTe in photocurrent appears. The time of CdTe layer deposition influences as well the value of the diffusion length of electrons Ln determined from QE measurements. In the case when the time of deposition is 3.5-4 min the spectral response includes a plateau expanding between band gap of CdTe and CdS. The diffusion length of the electrons in CdTe is Ln = 1.44 mm. The long wavelength cutoff implies an effective gap energy of about 1.48 eV. In the case when time of deposition is 5 min the Ln = 0.21 mm. Investigation of micro-nonuniformities in cell photocurrent response shows a big region where there is significantly smaller photo-current. The investigations suggest that the diffusion of CdS into CdTe reduces the lattice mismatch between CdS and CdTe by forming CdTe1-xSx buffer layer. (authors)

  15. Electrolytically deposited Cadmium Selenide Films for Photovoltaic Applications

    Directory of Open Access Journals (Sweden)

    Palaiologopoulou M. D.

    2012-10-01

    Full Text Available CdSe films were electrodeposited on pure nickel substrates. The nickel substrate was polished to a mirror finish by Al2O3 paste, etched in 10% HCl solution for 40 s and rinsed thoroughly by de-ionized water. The deposition bath contained solutions with excessive Cd2+ (0.2M from CdSO4 and small amounts of SeO2 (1x10-3 M. The pH of the bath was adjusted to a value of 2.2 at RT by adding 10% H2SO4. The bath was first thermostated at the required temperature, which varied from 55°C to 65°C. Plating was accomplished at deposition potential 1000 mV (vs. Hg/Hg2SO4. The films formed had a uniform thickness and it was found to be approximately 2.0 μm thick (for 20 min electrodeposition process. The produced CdSe films were characterized by X-Ray diffraction and SEM. The induced semiconductor doping effect by thermal annealing in pure dry nitrogen gas was also investigated. Gold contacts were placed on top of the CdSe films, either by evaporation, or mechanically. Depending on the deposition parameters the electrical characteristics of the Ni/CdSe/Au structures may exhibit rectification properties. The optical excitation of the structure was investigated for various CdSe thicknesses.

  16. Production of selective membranes using plasma deposited nanochanneled thin films

    Directory of Open Access Journals (Sweden)

    Rodrigo Amorim Motta Carvalho

    2006-12-01

    Full Text Available The hydrolization of thin films obtained by tetraethoxysilane plasma polymerization results in the formation of a nanochanneled silicone like structure that could be useful for the production of selective membranes. Therefore, the aim of this work is to test the permeation properties of hydrolyzed thin films. The films were tested for: 1 permeation of polar organic compounds and/or water in gaseous phase and 2 permeation of salt in liquid phase. The efficiency of permeation was tested using a quartz crystal microbalance (QCM technique in gas phase and conductimetric analysis (CA in liquid phase. The substrates used were: silicon for characterization of the deposited films, piezoelectric quartz crystals for tests of selective membranes and cellophane paper for tests of permeation. QCM analysis showed that the nanochannels allow the adsorption and/or permeation of polar organic compounds, such as acetone and 2-propanol, and water. CA showed that the films allow salt permeation after an inhibition time needed for hydrolysis of the organic radicals within the film. Due to their characteristics, the films can be used for grains protection against microorganism proliferation during storage without preventing germination.

  17. Sol-gel deposited nickel oxide films for electrochromic applications

    Energy Technology Data Exchange (ETDEWEB)

    Ozkan Zayim, E.; Turhan, I.; Tepehan, F.Z. [Istanbul Technical University, Faculty of Science and Literature, Maslak 34469, Istanbul (Turkey); Ozer, N. [San Francisco State University, School of Engineering, San Francisco, CA 94132 (United States)

    2008-02-15

    The electrochromic (EC) behavior, the microstructure, and the morphology of sol-gel deposited nickel oxide (NiO{sub x}) coatings were investigated. The films were produced by spin and dip-coating techniques on indium tin oxide (ITO)/glass and Corning glass (2947) substrates. The coating solutions were prepared by reacting nickel(II) 2-ethylhexanoate as the precursor, and isopropanol as the solvent. NiO{sub x} was heat treated at 350 C for 1 h. The surface morphology, crystal structure, and EC characteristics of the coatings were investigated by scanning electron microscopy (SEM), electron dispersive spectroscopy (EDS), atomic force spectroscopy (AFM), X-ray diffractometry (XRD), and cyclic voltammetry (CV). SEM and AFM images revealed that the surface morphology and surface characteristics of the spin- and dip-coated films on both types of substrate were different. XRD spectra revealed that both films were amorphous, either on ITO or Corning glass substrates. CV showed a reversible electrochemical insertion or extraction of the K{sup +} ions, cycled in 1 M KOH electrolyte, in both type of film. The crystal structure of the cycled films was found to be XRD amorphous. Spectroelectrochemistry demonstrated that dip-coated films were more stable up to 1000 coloration-bleaching cycles, whereas spin-coated films gradually degraded after 500 cycles. (author)

  18. Stress in sputter-deposited Cr films: Influence of Ar pressure

    NARCIS (Netherlands)

    Grachev, S.Y.; Tichelaar, F.D.; Janssen, G.C.A.M.

    2005-01-01

    We studied the tensile stress and grain-width evolution in sputter-deposited Cr films with thickness from 20 nm to 2.7 μm. Films were deposited in an industrial Hauzer 750 physical vapor deposition machine at 50–80 °C. The films exhibited a columnar microstructure. A power law behavior of the tensil

  19. Electrochemical investigations on spray deposited tin oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Patil, P.S.; Chigare, P.S.; Sadale, S.B.; Mujawar, S.H.; Shinde, P.S. [Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, Maharashtra (India)

    2007-06-15

    Tin oxide (SnO{sub 2}) thin films were prepared by a simple and inexpensive spray pyrolysis technique from an aqueous solution at various substrate temperatures viz. 300, 400 and 500 C, and their electrochemical studies have been carried out. The thin films have been optically and electrochemically characterized by means of transmittance, cyclic voltammetry and chronoamperometry. The mechanism of reduction and oxidation reactions that took place during the potential cycling is presented. The samples deposited at 500 C exhibit better performance in terms of coloration efficiency, reversibility, contrast ratio and response time. (author)

  20. Direct Deposition of Metal Film Patterns Using Nitrogen Laser

    OpenAIRE

    Reznikova, E.; Chesnokov, V.; Zharkova, G.; Igumenov, I.

    1995-01-01

    Rhenium, gold and platinum film micropatterns were obtained by the LCVD method on the surface of silicon and glass substrates from vapors of Re2(CO)10, (CH3)2Au(dpm), Pt(hfa)2, respectively. The heated reaction chamber at atmospheric pressure with a flow of an inert gas-carrier was used. The high marginal sharpness and the thickness uniformity of deposited films was provided by the use of a powerful nanosecond pulse nitrogen laser (λ = 337 nm), a projective system for delineation of the irrad...

  1. Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hennessy, John, E-mail: john.j.hennessy@jpl.nasa.gov; Jewell, April D.; Balasubramanian, Kunjithapatham; Nikzad, Shouleh [Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, California 91109 (United States)

    2016-01-15

    Aluminum fluoride (AlF{sub 3}) is a low refractive index material with promising optical applications for ultraviolet (UV) wavelengths. An atomic layer deposition process using trimethylaluminum and anhydrous hydrogen fluoride has been developed for the deposition of AlF{sub 3} at substrate temperatures between 100 and 200 °C. This low temperature process has resulted in thin films with UV-optical properties that have been characterized by ellipsometric and reflection/transmission measurements at wavelengths down to 200 nm. The optical loss for 93 nm thick films deposited at 100 °C was measured to be less than 0.2% from visible wavelengths down to 200 nm, and additional microstructural characterization demonstrates that the films are amorphous with moderate tensile stress of 42–105 MPa as deposited on silicon substrates. X-ray photoelectron spectroscopy analysis shows no signature of residual aluminum oxide components making these films good candidates for a variety of applications at even shorter UV wavelengths.

  2. Photoelectrical properties of ZnS thin films deposited from aqueous solution using pulsed electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Fathy, Naglaa; Ichimura, Masaya [Nagoya Inst. of Technology, Aichi (Japan). Dept. of Engineering, Physics, Electronics and Mechanics

    2005-05-01

    ZnS is an n-type semiconductor with a wide direct band gap (3.7 eV at room temperature), and it is very suitable as a window layer in heterojunction photovoltaic solar cells. We deposited ZnS thin films on Sn-doped In{sub 2}O{sub 3}-coated glass substrate using pulsed electrochemical deposition (ECD) from aqueous solutions containing Na{sub 2}S{sub 2}O{sub 3} and ZnSO{sub 4} with two different compositions, the first group grown from ZnSO{sub 4}-rich solution, and the second grown from Na{sub 2}S{sub 2}O{sub 3}-rich solution. We investigated electrical properties of the ZnS thin films and properties of contacts with different metals evaporated on the surfaces. We found that Au and In contacts have Ohmic-like characteristics to ZnS. Furthermore, we observed photoconductivity of the ZnS thin films by means of photoelectrochemical (PEC) measurements. We found that for both the groups of ZnS thin films, the as-deposited film shows weak photosensitivity and after annealing at 300 {sup o}C the photosensitivity improved. (Author)

  3. Studies of CdS/CdTe interface: Comparison of CdS films deposited by close space sublimation and chemical bath deposition techniques

    International Nuclear Information System (INIS)

    The CdS layers were deposited by two different methods, close space sublimation (CSS) and chemical bath deposition (CBD) technique. The CdS/CdTe interface properties were investigated by transmission electron microscope (TEM) and X-ray photoelectron spectroscopy (XPS). The TEM images showed a large CSS-CdS grain size in the range of 70-80 nm. The interface between CSS-CdS and CdTe were clear and sharp, indicating an abrupt hetero-junction. On the other hand, CBD-CdS layer had much smaller grain size in the 5-10 nm range. The interface between CBD-CdS and CdTe was not as clear as CSS-CdS. With the stepwise coverage of CdTe layer, the XPS core levels of Cd 3d and S 2p in CSS-CdS had a sudden shift to lower binding energies, while those core levels shifted gradually in CBD-CdS. In addition, XPS depth profile analyses indicated a strong diffusion in the interface between CBD-CdS and CdTe. The solar cells prepared using CSS-CdS yielded better device performance than the CBD-CdS layer. The relationships between the solar cell performances and properties of CdS/CdTe interfaces were discussed. - Highlights: • Studies of CdS deposited by close space sublimation and chemical bath deposition • An observation of CdS/CdTe interface by transmission electron microscope • A careful investigation of CdS/CdTe interface by X ray photoelectron spectra • An easier diffusion at the chemical bath deposition CdS and CdTe interface

  4. Optical properties and morphology of PECVD deposited titanium dioxide films

    Directory of Open Access Journals (Sweden)

    J. Kowalski

    2009-12-01

    Full Text Available Purpose: The purpose of the present work is to compare the structure and optical properties, with respect to their potential optical applications, of titanium dioxide films synthesized with the PECVD method from two different precursor materials, namely titanium tetrachloride and titanium tetraethoxide (TEOT.Design/methodology/approach: Optical properties as well as thickness of the films were analyzed by means of Variable Angle Spectroscopic Ellipsometry (VASE. Morphology studies were carried out by Scanning Electron Microscopy (SEM and chemical composition characterisation was performed with the help of Energy Dispersive Spectroscopy (EDS unit coupled with the electron microscope.Findings: Optical parameters approaching those of titanium dioxide were achieved for both precursors. Studies of morphology show that the films produced from TEOT have favourable, smooth surface in contradiction to broccoli-like structure obtained for the chloride precursor. The type of substance used for titanium oxides synthesis determined chemical composition of the films resulting in their enrichment with either chlorine or carbon, depending on the precursor composition.Practical implications: The optical quality of the films is good enough to suggest their applications in stack multilayer interference filters. The refractive index values of these films advocate their use as high refractive index materials while their low extinction coefficients assure the devices transparency.Originality/value: The work presents deposition rates as well as the films optical properties, chemical composition and morphology in relation to operational parameters of their synthesis. It also provides a comparison of these characteristics for two competitive precursor compounds. Finally, it presents the capability of PECVD method for the deposition of optical coatings onto polymer substrates.

  5. Thin films of barium fluoride scintillator deposited by chemical vapor deposition

    International Nuclear Information System (INIS)

    We have used metal-organic chemical vapor deposition (MOCVD) technology to coat optical substrates with thin (≅ 1-10 μm thick) films of inorganic BaF2 scintillator. Scanning electron microscope (SEM) photographs indicate that high-quality epitaxial crystalline film growth was achieved, with surface defects typically smaller than optical wavelengths. The scintillation light created by the deposition of ionizing radiation in the scintillating films was measured with a photomultiplier and shown to be similar to bulk melt-grown crystals. The results demonstrate the potential of these composite optical materials for planar and fiber scintillation radiation detectors in high energy and nuclear physics, synchrotron radiation research, and in radiation and X-ray imaging and monitoring. (orig.)

  6. Structural and Optical Properties of Chemical Bath Deposited Silver Oxide Thin Films: Role of Deposition Time

    Directory of Open Access Journals (Sweden)

    A. C. Nwanya

    2013-01-01

    Full Text Available Silver oxide thin films were deposited on glass substrates at a temperature of 50°C by chemical bath deposition technique under different deposition times using pure AgNO3 precursor and triethanolamine as the complexing agent. The chemical analysis based on EDX technique shows the presence of Ag and O at the appropriate energy levels. The morphological features obtained from SEM showed that the AgxO structures varied as the deposition time changes. The X-ray diffraction showed the peaks of Ag2O and AgO in the structure. The direct band gap and the refractive index increased as the deposition time increased and was in the range of 1.64–1.95 eV and 1.02–2.07, respectively. The values of the band gap and refractive index obtained indicate possible applications in photovoltaic and photothermal systems.

  7. Beam-Induced Deposition of Thin Metallic Films.

    Science.gov (United States)

    Funsten, Herbert Oliver, III

    1990-01-01

    Ion and electron beam induced deposition (BID) of thin (1 μm), conductive films is accomplished by dissociating and removing the nonmetallic components of an adsorbed, metal-based, molecular gas. Current research has focused primarily on room temperature (monolayer adsorption) BID using electrons and slow, heavy ions. This study investigates low temperature (50 to 200 K) BID in which the condensation of the precursor gases (SnCl _4 and (CH_3) _4Sn) maximizes the efficiency of the incident radiation which can create and remove nonmetallic fragments located several monolayers below the film surface. The desired properties of the residual metallic films are produced by using as incident radiation either nuclear (35 keV Ar ^+) or electronic (2 keV electrons, 25 keV H^+, or 50 keV H ^+) energy loss mechanisms. Residual films are analyzed ex situ by Scanning Electron Microscopy (SEM), thickness measurements, resistivity measurements, Rutherford Backscattering Spectroscopy (RBS), and infrared spectroscopy. Low temperature BID film growth models, which are derived from both a computer simulation and a mathematical analysis, closely agree. Both the fragmentation and sputtering cross sections for a particular ion and energy are derived for films created from (CH_3) _4Sn. The fragmentation cross section, which corresponds to film growth, is roughly related to the electronic stopping power by the 1.9 power. The loss of carbon in films which were created from (CH_3) _4Sn is strongly dependent on the nuclear stopping power. Film growth rates for low temperature BID have been found to be 10 times those of room temperature BID.

  8. Thin film deposition of arsenic free pnictide superconductors

    Energy Technology Data Exchange (ETDEWEB)

    Buckow, Alexander U.

    2015-05-13

    The aim of this work is the thin film deposition of arsenic free pnictide superconductor by reactive molecular beam epitaxy (r-MBE). Starting from the so-called '1111'-phase, it is attempted to deposit LaNiBiO{sub 1-x} on MgO substrates. The deposited polycrystalline films are characterized by X-ray diffraction and four-point resistivity measurement, phase pure, single crystal layers are, however, not realized due to the required oxidation conditions. Therefore, the focus is placed on oxygen-free layers and it is a so-called '122'-phase, La{sub 1-x}Ni{sub 2}Bi{sub 2} deposited. During the process parameters optimization of this phase, the so-called '112'-phase, LaNi{sub 1} XBi{sub 2}, is discovered. The procedure of the process parameters optimization for the deposition of the new phase is described in detail. The single-crystal, epitaxial layers are analyzed using X-ray diffractometer, four-point resistivity measurement and SQUID magnetometer. The layers are superconducting below 4 K. The influence of the Ni and the Bi content is examined. In addition the La is substituted by Ce, which results in an increase of superconducting transition temperature. Here, too, the influence of the Ni and Bi content is examined.

  9. Biaxial CdTe/CaF{sub 2} films growth on amorphous surface

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, W., E-mail: yuanw@rpi.ed [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Tang, F.; Li, H.-F.; Parker, T. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); LiCausi, N. [Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Lu, T.-M. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Bhat, I. [Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Wang, G.-C. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Lee, S. [US Army Armament Research, Development and Engineering Center, Benet Labs, Watervliet, NY 12189 (United States)

    2009-10-30

    A continuous and highly biaxially textured CdTe film was grown by metal organic chemical vapor deposition on an amorphous substrate using biaxial CaF{sub 2} nanorods as a buffer layer. The interface between the CdTe film and CaF{sub 2} nanorods and the morphology of the CdTe film were studied by transmission electron microscopy (TEM) and scanning electron microscopy. Both the TEM and X-ray pole figure analysis clearly reveal that the crystalline orientation of the continuous CdTe film followed the {l_brace}111{r_brace}<121> biaxial texture of the CaF{sub 2} nanorods. A high density of twin faults was observed in the CdTe film. Furthermore, the near surface texture of the CdTe thin film was investigated by reflection high-energy electron diffraction (RHEED) and RHEED surface pole figure analysis. Twinning was also observed from the RHEED surface pole figure analysis.

  10. Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

    International Nuclear Information System (INIS)

    Ruthenium thin films were deposited on argon plasma-treated SiO2 and untreated SiO2 substrates by remote plasma atomic layer deposition using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a Ru precursor and ammonia plasma as a reactant. The results of in situ Auger electron spectroscopy (AES) analysis indicate that the initial transient region of Ru deposition was decreased by Ar plasma treatment at 400 deg. C, but did not change significantly at 300 deg. C The deposition rate exhibited linearity after continuous film formation and the deposition rates were about 1.7 A/cycle and 0.4 A/cycle at 400 deg. C and 300 deg. C, respectively. Changes of surface energy and polar and dispersive components were measured by the sessile drop test. The quantity of surface amine groups was measured from the surface nitrogen concentration with AES. Furthermore, the Ar plasma-treated SiO2 contained more amine groups and less hydroxyl groups on the surface than on untreated SiO2. Auger spectra exhibited chemical shifts by Ru-O bonding, and larger shifts were observed on untreated substrates due to the strong adhesion of Ru films.

  11. Thin film cadmium telluride, zinc telluride, and mercury zinc telluride solar cells. Final subcontract report, 1 July 1988--31 December 1991

    Energy Technology Data Exchange (ETDEWEB)

    Chu, T.L. [University of South Florida, Tampa, FL (United States)

    1992-04-01

    This report describes research to demonstrate (1) thin film cadmium telluride solar cells with a quantum efficiency of 75% or higher at 0. 44 {mu}m and a photovoltaic efficiency of 11.5% or greater, and (2) thin film zinc telluride and mercury zinc telluride solar cells with a transparency to sub-band-gap radiation of 65% and a photovoltaic conversion efficiency of 5% and 8%, respectively. Work was directed at (1) depositing transparent conducting semiconductor films by solution growth and metal-organic chemical vapor deposition (MOCVD) technique, (2) depositing CdTe films by close-spaced sublimation (CSS) and MOCVD techniques, (3) preparing and evaluating thin film CdTe solar cells, and (4) preparing and characterizing thin film ZnTe, CD{sub 1-x}Zn{sub 1-x}Te, and Hg{sub 1-x}Zn{sub x}Te solar cells. The deposition of CdS films from aqueous solutions was investigated in detail, and their crystallographic, optical, and electrical properties were characterized. CdTe films were deposited from DMCd and DIPTe at 400{degrees}C using TEGa and AsH{sub 3} as dopants. CdTe films deposited by CSS had significantly better microstructures than those deposited by MOCVD. Deep energy states in CdTe films deposited by CSS and MOCVD were investigated. Thin films of ZnTe, Cd{sub 1- x}Zn{sub x}Te, and Hg{sub 1-x}Zn{sub x}Te were deposited by MOCVD, and their crystallographic, optical, and electrical properties were characterized. 67 refs.

  12. Rapid Deposition of Titanium Oxide and Zinc Oxide Films by Solution Precursor Plasma Spray

    Science.gov (United States)

    Ando, Yasutaka

    In order to develop a high rate atmospheric film deposition process for functional films, as a basic study, deposition of titanium oxide film and zinc oxide film by solution precursor plasma spray (SPPS) was conducted in open air. Consequently, in the case of titanium oxide film deposition, anantase film and amorphous film as well as rutile film could be deposited by varying the deposition distance. In the case of anatase dominant film, photo-catalytic properties of the films could be confirmed by wettability test. In addition, the dye sensitized sollar cell (DSC) using the TiO2 film deposited by this SPPS technique as photo voltaic device generates 49mV in OCV. On the other hand, in the case of zinc oxide film deposition, it was proved that well crystallized ZnO films with photo catalytic properties could be deposited. From these results, this process was found to have high potential for high rate functional film deposition process conducted in the air.

  13. Growth Model for Pulsed-Laser Deposited Perovskite Oxide Films

    Institute of Scientific and Technical Information of China (English)

    WANG Xu; FEI Yi-Yan; ZHU Xiang-Dong; Lu Hui-Bin; YANG Guo-Zhen

    2008-01-01

    We present a multi-level growth model that yields some of the key features of perovskite oxide film growth as observed in the reflection high energy electron diffraction(RHEED)and ellipsometry studies.The model describes the effect of deposition,temperature,intra-layer transport,interlayer transport and Ostwald ripening on the morphology of a growth surface in terms of the distribution of terraces and step edges during and after deposition.The numerical results of the model coincide well with the experimental observation.

  14. A Comprehensive Study on Mo/CdTe Metal-Semiconductor Interface Deposited by Radio Frequency Magnetron Sputtering.

    Science.gov (United States)

    Dhar, N; Khan, N A; Chelvanathan, P; Akhtaruzzaman, M; Alam, M M; Alothman, Z A; Sopian, K; Amin, N

    2015-11-01

    Metal-semiconductor (MS) junction between Mo and CdTe, which is one of the fundamental issues for CdTe based solar cell, has been investigated for films deposited on different substrates. XRD pattern of Mo/CdTe films on the polyimide (PI) substrate shows a strong preferential orientation of MoTe2 in (100) at 2θ = 29.44 degrees, which becomes less apparent as deposition time of CdTe increases. However, on soda lime glass (SLG) no such XRD reflection pattern is observed. Moreover, from EDX measurement, Mo-Te compound also identifies MoTe2 at Mo/CdTe interface on PI substrate, which is not present on SLG. Bulk carrier concentration of Mo/CdTe films on PI substrate for lower deposition time of CdTe is found 1.42 x 10(18) cm(-3), which is almost equal to MoTe2. Thereafter, it decreases as CdTe growth time increases. The type of unintentionally formed MoTe2 on PI substrate is found to be n-type in nature. Lattice constants of a = 6.5 Å for CdTe and a = 3.52 Å for MoTe2 are found from nanostructure study by TEM. PMID:26726685

  15. Methods of Boron-carbon Deposited Film Removal

    Science.gov (United States)

    Airapetov, A.; Terentiev, V.; Voituk, A.; Zakharov, A.

    Boron carbide was proposed as a material for in-situ renewable protecting coating for tungsten tiles of the ITER divertor. It is necessary to develop a method of gasification of boron-carbon film which deposits during B4C sputtering. In this paper the results of the first stage investigation of gasification methods of boron-carbon films are presented. Two gasification methods of films are investigated: interaction with the ozone-oxygen mixture and irradiation in plasma with the working gas composed of oxygen, ethanol, and, in some cases, helium. The gasification rate in the ozone-oxygen mixture at 250 °C for B/C films with different B/C ratio and carbon fiber composite (CFC), was measured. For B/C films the gasification rate decreased with increasing B/C ratio (from 45 nm/h at B/C=0.7 to 4 nm/h at B/C=2.1; for CFC - 15 μm/h). Films gasification rates were measured under ion irradiation from ethanol-oxygen-helium plasma at different temperatures, with different ion energies and different gas mixtures. The maximum obtained removal rate was near 230 nm/h in case of ethanol-oxygen plasma and at 150°C of the sample temperature.

  16. Thin-film cadmium telluride solar cells

    Science.gov (United States)

    Chu, T. L.

    1986-08-01

    The major objective of this work was to demonstrate CdTe devices grown by chemical vapor deposition (CVD) with a total area greater than 1 cm2 and photovoltic efficiencies of at least 13%. During the period covered, various processing steps were investigated for the preparation of thin-film CdTe heterojunction solar cells of the inverted configuration. Glass coated with fluorine-doped tin oxide was used as the substrate. Thin-film heterojunction solar cells were prepared by depositing p-CdTe films on substrates using CVD and close-spaced sublimation (CSS). Cells prepared from CSS CdTe usually have a higher conversion efficiency than those prepared from CVD CdTe, presumably due to the chemical interaction between CdS and CdTe at the interface during the CVD process. The best cell, about 1.2 sq cm in area, had an AM 1.5 (global) efficiency of 10.5%, and further improvements are expected by optimizing the process parameters.

  17. DLC Films Deposited by the DC PACVD Method

    Directory of Open Access Journals (Sweden)

    D. Palamarchuk

    2003-01-01

    Full Text Available DLC (Diamond-Like Carbon coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  18. DLC Films Deposited by the DC PACVD Method

    OpenAIRE

    D. Palamarchuk; M. Zoriy; J. Gurovič; F. Černý; S. Konvičková; I. Hüttel

    2003-01-01

    DLC (Diamond-Like Carbon) coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition) method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  19. Texture development of CeO2 thin films deposited by ion beam assisted deposition

    International Nuclear Information System (INIS)

    CeO2 thin films were prepared on amorphous quartz glass substrates by the ion beam assisted deposition (IBAD) technique at room temperature. In order to control both the in-plane and out-of-plane texture of the films, a special geometrical arrangement of the ion sources, the target, and the substrate was used. A new concept, considering the role of reflected particles from the target, which we call self-IBAD, was introduced. The structural properties of the CeO2 films were investigated by x-ray diffraction. Good biaxially textured films were obtained with out-of-plane mosaic spreads of 3.0 deg. and in-plane alignment of 10.8 deg. C

  20. Electrochemical deposition of conductive and adhesive polypyrrole-dopamine films

    Science.gov (United States)

    Kim, Semin; Jang, Lindy K.; Park, Hyun S.; Lee, Jae Young

    2016-07-01

    Electrode surfaces have been widely modified with electrically conductive polymers, including polypyrrole (PPY), to improve the performance of electrodes. To utilize conductive polymers for electrode modification, strong adhesion between the polymer films and electrode substrates should be ensured with high electrical/electrochemical activities. In this study, PPY films were electrochemically polymerized on electrodes (e.g., indium tin oxide (ITO)) with dopamine as a bio-inspired adhesive molecule. Efficient and fast PPY electrodeposition with dopamine (PDA/PPY) was found; the resultant PDA/PPY films exhibited greatly increased adhesion strengths of up to 3.7 ± 0.8 MPa and the modified electrodes had electrochemical impedances two to three orders of magnitude lower than that of an unmodified electrode. This electrochemical deposition of adhesive and conductive PDA/PPY offers a facile and versatile electrode modification for various applications, such as biosensors and batteries.

  1. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films

    Energy Technology Data Exchange (ETDEWEB)

    Shin Jinhong [Texas Materials Institute, University of Texas at Austin, Austin, TX 78750 (United States); Waheed, Abdul [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Winkenwerder, Wyatt A. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Kim, Hyun-Woo [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Agapiou, Kyriacos [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Jones, Richard A. [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Hwang, Gyeong S. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Ekerdt, John G. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States)]. E-mail: ekerdt@che.utexas.edu

    2007-05-07

    Chemical vapor deposition growth of amorphous ruthenium-phosphorus films on SiO{sub 2} containing {approx} 15% phosphorus is reported. cis-Ruthenium(II)dihydridotetrakis-(trimethylphosphine), cis-RuH{sub 2}(PMe{sub 3}){sub 4} (Me = CH{sub 3}) was used at growth temperatures ranging from 525 to 575 K. Both Ru and P are zero-valent. The films are metastable, becoming increasingly more polycrystalline upon annealing to 775 and 975 K. Surface studies illustrate that demethylation is quite efficient near 560 K. Precursor adsorption at 135 K or 210 K and heating reveal the precursor undergoes a complex decomposition process in which the hydride and trimethylphosphine ligands are lost at temperatures as low at 280 K. Phosphorus and its manner of incorporation appear responsible for the amorphous-like character. Molecular dynamics simulations are presented to suggest the local structure in the films and the causes for phosphorus stabilizing the amorphous phase.

  2. Laser-assisted deposition of thin C60 films

    DEFF Research Database (Denmark)

    Schou, Jørgen; Canulescu, Stela; Fæster, Søren

    Metal and metal oxide films with controlled thickness from a fraction of a monolayer up more than 1000 nm and known stoichiometry can be produced by pulsed laser deposition (PLD) relatively easily, and (PLD) is now a standard technique in all major research laboratories within materials science....... However, organic materials are usually not well suited for direct laser irradiation, since the organic molecules may suffer from fragmentation by the laser light. We have, therefore, explored the possible fragmentation of organic molecules by attempting to produce thin films of C60 which is a strongly...... bound carbon molecule with a well-defined mass (M = 720 amu) and therefore a good, organic test molecule. C60 fullerene thin films of average thickness of more than 100 nm was produced in vacuum by matrix-assisted pulsed laser evaporation (MAPLE). A 355 nm Nd:YAG laser was directed onto a frozen target...

  3. Electrochemical deposition of conductive and adhesive polypyrrole-dopamine films.

    Science.gov (United States)

    Kim, Semin; Jang, Lindy K; Park, Hyun S; Lee, Jae Young

    2016-01-01

    Electrode surfaces have been widely modified with electrically conductive polymers, including polypyrrole (PPY), to improve the performance of electrodes. To utilize conductive polymers for electrode modification, strong adhesion between the polymer films and electrode substrates should be ensured with high electrical/electrochemical activities. In this study, PPY films were electrochemically polymerized on electrodes (e.g., indium tin oxide (ITO)) with dopamine as a bio-inspired adhesive molecule. Efficient and fast PPY electrodeposition with dopamine (PDA/PPY) was found; the resultant PDA/PPY films exhibited greatly increased adhesion strengths of up to 3.7 ± 0.8 MPa and the modified electrodes had electrochemical impedances two to three orders of magnitude lower than that of an unmodified electrode. This electrochemical deposition of adhesive and conductive PDA/PPY offers a facile and versatile electrode modification for various applications, such as biosensors and batteries. PMID:27459901

  4. Epitaxial copper oxide thin films deposited on cubic oxide substrates

    International Nuclear Information System (INIS)

    We study the growth conditions of Cu2O thin films deposited on MgO (0 0 1) and SrTiO3 (0 0 1) substrates by pulsed laser ablation, in order to explore the compatibility between semiconducting p-type Cu2O and other perovskite oxides in view of the fabrication of oxide electronics heterostructures. We find that in both cases perfect epitaxy, high crystalline quality and good out-of-plane orientation are achieved. In this context, epitaxy plays a major role in driving the phase formation. On the other hand, in films deposited at temperatures higher than 700 deg. C transport is inhibited by poor grain connectivity, which is an inevitable consequence of the necessity for the crystal to release the lattice strain. Instead, better connectivity and bulk-like values of resistivity, as well as good crystallinity and orientation, are obtained for films deposited at 650 deg. C. This should be kept in mind for the fabrication of stacked layer oxide heterostructures, where deep grooves between adjacent grains would be a serious drawback both for vertical and planar transport

  5. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Ciudad Universitaria, Carrera 30 Numero 45-03, Bogota (Colombia); Huerta, L. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)], E-mail: ser42@iim.unam.mx; Escamilla, R. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)

    2008-10-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T{sub C}). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T{sub C} values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T{sub C} was correlated to a higher contribution of the N 2p states.

  6. Optical properties of thermally evaporated cadmium telluride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Khairnar, U.P.; Bhavsar, D.S.; Vaidya, R.U.; Bhavsar, G.P

    2003-05-26

    Polycrystalline CdTe films have been deposited onto glass substrates at 373 K by vacuum evaporation technique. The transmittance and reflectance have been measured at normal and near normal incidence, respectively, in the spectral range 200-2500 nm. The dependence of absorption coefficient, {alpha} on the photon energy have been determined. Analysis of the result showed that for CdTe films of different thicknesses, direct transition occurs with band gap energies in the range 1.45-1.52 eV. Refractive indices and extinction coefficients have been evaluated in the above spectral range. The XRD analysis confirmed that CdTe films are polycrystalline having hexagonal structure. The lattice parameters of thin films are almost matching with the JCPDS 82-0474 data for cadmium telluride.

  7. Plasma-enhanced Deposition of Nano-Structured Carbon Films

    Institute of Scientific and Technical Information of China (English)

    Yang Qiaoqin (杨巧勤); Xiao Chijin (肖持进); A. Hirose

    2005-01-01

    By pre-treating substrate with different methods and patterning the catalyst, selective and patterned growth of diamond and graphitic nano-structured carbon films have been realized through DC Plasma-Enhanced Hot Filament Chemical Vapor Deposition (PE-HFCVD).Through two-step processing in an HFCVD reactor, novel nano-structured composite diamond films containing a nanocrystalline diamond layer on the top of a nanocone diamond layer have been synthesized. Well-aligned carbon nanotubes, diamond and graphitic carbon nanocones with controllable alignment orientations have been synthesized by using PE-HFCVD. The orientation of the nanostructures can be controlled by adjusting the working pressure. In a Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) reactor, high-quality diamond films have been synthesized at low temperatures (310 ℃~550 ℃) without adding oxygen or halogen gas in a newly developed processing technique. In this process, carbon source originates from graphite etching, instead of hydrocarbon. The lowest growth temperature for the growth of nanocrystalline diamond films with a reasonable growth rate without addition of oxygen or halogen is 260 ℃.

  8. Atomic layer deposition of superparamagnetic and ferrimagnetic magnetite thin films

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Yijun; Liu, Ming, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca; Ren, Wei, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca [Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education and International Center for Dielectric Research, Xi' an Jiaotong University, Xi' an 710049 (China); Zhang, Yuepeng; Chen, Xing [Energy Systems Division, Argonne National Laboratory, Lemont, Illinois 60439 (United States); Ye, Zuo-Guang, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca [Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education and International Center for Dielectric Research, Xi' an Jiaotong University, Xi' an 710049 (China); Department of Chemistry and 4D LABS, Simon Fraser University, Burnaby, British Columbia V5A 1S6 (Canada)

    2015-05-07

    One of the key challenges in realizing superparamagnetism in magnetic thin films lies in finding a low-energy growth way to create sufficiently small grains and magnetic domains which allow the magnetization to randomly and rapidly reverse. In this work, well-defined superparamagnetic and ferrimagnetic Fe{sub 3}O{sub 4} thin films are successfully prepared using atomic layer deposition technique by finely controlling the growth condition and post-annealing process. As-grown Fe{sub 3}O{sub 4} thin films exhibit a conformal surface and poly-crystalline nature with an average grain size of 7 nm, resulting in a superparamagnetic behavior with a blocking temperature of 210 K. After post-annealing in H{sub 2}/Ar at 400 °C, the as-grown α−Fe{sub 2}O{sub 3} sample is reduced to Fe{sub 3}O{sub 4} phase, exhibiting a ferrimagnetic ordering and distinct magnetic shape anisotropy. Atomic layer deposition of magnetite thin films with well-controlled morphology and magnetic properties provides great opportunities for integrating with other order parameters to realize magnetic nano-devices with potential applications in spintronics, electronics, and bio-applications.

  9. Structural and electrical properties of electric field assisted spray deposited pea structured ZnO film

    Science.gov (United States)

    Chaturvedi, Neha; Swami, Sanjay Kumar; Dutta, Viresh

    2016-05-01

    Spray deposition of ZnO film was carried out. The uneven growth of ZnO nanostructures is resulted for spray deposited ZnO film. Application of DC voltage (1000V) during spray deposition provides formation of pea like structures with uniform coverage over the substrate. Electric field assisted spray deposition provides increased crystallinity with reduced resistivity and improved mobility of the ZnO film as compared to spray deposited ZnO film without electric field. This with large area deposition makes the process more efficient than other techniques.

  10. Homogeneous CdTe quantum dots-carbon nanotubes heterostructures

    International Nuclear Information System (INIS)

    The development of homogeneous CdTe quantum dots-carbon nanotubes heterostructures based on electrostatic interactions has been investigated. We report a simple and reproducible non-covalent functionalization route that can be accomplished at room temperature, to prepare colloidal composites consisting of CdTe nanocrystals deposited onto multi-walled carbon nanotubes (MWCNTs) functionalized with a thin layer of polyelectrolytes by layer-by-layer technique. Specifically, physical adsorption of polyelectrolytes such as poly (4-styrene sulfonate) and poly (diallyldimethylammonium chloride) was used to deagglomerate and disperse MWCNTs, onto which we deposited CdTe quantum dots coated with mercaptopropionic acid (MPA), as surface ligand, via electrostatic interactions. Confirmation of the CdTe quantum dots/carbon nanotubes heterostructures was done by transmission and scanning electron microscopies (TEM and SEM), dynamic-light scattering (DLS) together with absorption, emission, Raman and infrared spectroscopies (UV–vis, PL, Raman and FT-IR). Almost complete quenching of the PL band of the CdTe quantum dots was observed after adsorption on the MWCNTs, presumably through efficient energy transfer process from photoexcited CdTe to MWCNTs. - Highlights: • Highly homogeneous CdTe-carbon nanotubes heterostructures were prepared. • Simple and reproducible non-covalent functionalization route. • CdTe nanocrystals homogeneously deposited onto multi-walled carbon nanotubes. • Efficient energy transfer process from photoexcited CdTe to MWCNTs

  11. Homogeneous CdTe quantum dots-carbon nanotubes heterostructures

    Energy Technology Data Exchange (ETDEWEB)

    Vieira, Kayo Oliveira [Grupo de Pesquisa em Química de Materiais – (GPQM), Departamento de Ciências Naturais, Universidade Federal de São João del-Rei, Campus Dom Bosco, Praça Dom Helvécio, 74, CEP 36301-160, São João del-Rei, MG (Brazil); Bettini, Jefferson [Laboratório Nacional de Nanotecnologia, Centro Nacional de Pesquisa em Energia e Materiais, CEP 13083-970, Campinas, SP (Brazil); Ferrari, Jefferson Luis [Grupo de Pesquisa em Química de Materiais – (GPQM), Departamento de Ciências Naturais, Universidade Federal de São João del-Rei, Campus Dom Bosco, Praça Dom Helvécio, 74, CEP 36301-160, São João del-Rei, MG (Brazil); Schiavon, Marco Antonio, E-mail: schiavon@ufsj.edu.br [Grupo de Pesquisa em Química de Materiais – (GPQM), Departamento de Ciências Naturais, Universidade Federal de São João del-Rei, Campus Dom Bosco, Praça Dom Helvécio, 74, CEP 36301-160, São João del-Rei, MG (Brazil)

    2015-01-15

    The development of homogeneous CdTe quantum dots-carbon nanotubes heterostructures based on electrostatic interactions has been investigated. We report a simple and reproducible non-covalent functionalization route that can be accomplished at room temperature, to prepare colloidal composites consisting of CdTe nanocrystals deposited onto multi-walled carbon nanotubes (MWCNTs) functionalized with a thin layer of polyelectrolytes by layer-by-layer technique. Specifically, physical adsorption of polyelectrolytes such as poly (4-styrene sulfonate) and poly (diallyldimethylammonium chloride) was used to deagglomerate and disperse MWCNTs, onto which we deposited CdTe quantum dots coated with mercaptopropionic acid (MPA), as surface ligand, via electrostatic interactions. Confirmation of the CdTe quantum dots/carbon nanotubes heterostructures was done by transmission and scanning electron microscopies (TEM and SEM), dynamic-light scattering (DLS) together with absorption, emission, Raman and infrared spectroscopies (UV–vis, PL, Raman and FT-IR). Almost complete quenching of the PL band of the CdTe quantum dots was observed after adsorption on the MWCNTs, presumably through efficient energy transfer process from photoexcited CdTe to MWCNTs. - Highlights: • Highly homogeneous CdTe-carbon nanotubes heterostructures were prepared. • Simple and reproducible non-covalent functionalization route. • CdTe nanocrystals homogeneously deposited onto multi-walled carbon nanotubes. • Efficient energy transfer process from photoexcited CdTe to MWCNTs.

  12. Retention of heavy metals on layered double hydroxides thin films deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Vlad, A., E-mail: angela.vlad@gmail.com [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 76900 Bucharest-Magurele (Romania); Birjega, R.; Matei, A.; Luculescu, C.; Mitu, B.; Dinescu, M. [National Institute for Lasers, Plasma and Radiation Physics, 409 Atomistilor Str., 76900 Bucharest-Magurele (Romania); Zavoianu, R.; Pavel, O.D. [University of Bucharest, Faculty of Chemistry, Department of Chemical Technology and Catalysis, 4-12 Regina Elisabeta Bd., Bucharest (Romania)

    2014-05-01

    Heavy metals are toxic and hazardous pollutants in the environment due to their nonbiodegradability and persistence, which can pose serious threats to living organisms. The ability of Mg–Al based layered double hydroxides (LDHs) thin films to retain heavy metals from aqueous solutions at different concentrations is a novel topic with prospects of attractive applications, such as detection of heavy metals. We report on the ability of a series of Mg–Al based layered double hydroxides thin films to detect Ni and Co cations in aqueous solutions. Uptake of heavy metals ions such as Ni{sup 2+}, Co{sup 2+} from aqueous solutions was studied as function of contact time at a standard metal ion concentration. The LDHs thin films were deposited using pulsed laser deposition (PLD). The different adsorption mechanisms were studied in connection with different heavy metals used as probe cations. X-ray diffraction, atomic force microscopy, scanning electron microscopy coupled with energy dispersive X-ray spectroscopy, Fourier transform infra-red spectroscopy were the techniques used for the investigation of as deposited and after heavy metals retention thin films.

  13. Transport Properties of LCMO Granular Films Deposited by the Pulsed Electron Deposition Technique

    Institute of Scientific and Technical Information of China (English)

    CHEN Leiming; XU Bin; ZHANG Yan; CHEN Zhenping

    2011-01-01

    By finely controlling the deposition parameters in the pulsed electron deposition process,granular La2/3Ca1/3MnO3 (LCMO) film was grown on silicon substrates.The substrate temperature,ambient pressure in the deposition chamber and acceleration potential for the electron beam were all found to affect the grain size of the film,resulting in different morphologies of the samples.Transport properties of the obtained granular films,especially the magnetoresistance (MR),were studied.Prominent low-field MR was observed in all samples,indicating the forming of grain boundaries in the sample.The low-field MR show great sensitive to the morphology evolution,which reaches the highest value of about 40% for the sample with the grain size of about 250 nm.More interestingly,positive-MR (p-MR) was also detected above 300 K when low magnetic field applying,whereas it disappeared with higher magnetic field applied up to 1.5 and 2 Tesla.Instead of the spinpolarized tunneling process being commonly regarded as a responsible reason,lattice mismatch between LCMO film and silicon substrate appears to be the origin of the p-MR

  14. Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method

    Directory of Open Access Journals (Sweden)

    Nutthanun Moolsradoo

    2010-01-01

    Full Text Available Sulfur-doped diamond-like carbon films (S-DLC fabricated from C2H2 and SF6 mixtures were used to study the effects of sulfur content and negative pulse bias voltage on the deposition and tribological properties of films prepared by plasma-based ion implantation (PBII. The structure and relative concentration of the films were analyzed by Raman spectroscopy and Auger electron spectroscopy. Hardness and elastic modulus of films were measured by nanoindentation hardness testing. Tribological characteristics of films were performed using a ball-on-disk friction tester. The results indicate that with the increasing sulfur content, the hardness and elastic modulus decrease. Additionally, by changing the negative pulse bias voltage from 0 kV to −5 kV, the hardness and elastic modulus increase, while the friction coefficient and specific wear rate tends to decrease. Moreover, at a negative pulse bias voltage of −5 kV and flow-rate ratio of 1 : 2, there is considerable improvement in friction coefficient of 0.05 under ambient air is due to the formation of a transfer films on the interface. The decrease in the friction coefficient of films doped with 4.9 at.% sulfur is greater under high vacuum (0.03 than under ambient air (>0.1.

  15. Auger relative sensitivivity factors for CdTe oxide

    OpenAIRE

    Bartolo-Pérez, P.; Peña, J. L.; M.H. Farías

    1999-01-01

    The Auger lineshape of Te MNN in measurements of Auger spectra of CdTe oxide films with various degrees of oxidation was analyzed. By using standards from stoichiometric compounds, Auger relative sensitivity factors (RSF´s) of Cd, Te and O for CdTe oxide thin films were obtained. The value of the RFS of oxygen is about constant, 0.27-0.28, for the standard compound, CdO, TeO2 and CdTeO3 (considering the RSF of Cd as 1). However, the obtained RSF of Te changes from 0.69 in CdTe up to 0.87 in C...

  16. Process Development for High Voc CdTe Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Ferekides, C. S.; Morel, D. L.

    2011-05-01

    This is a cumulative and final report for Phases I, II and III of this NREL funded project (subcontract # XXL-5-44205-10). The main research activities of this project focused on the open-circuit voltage of the CdTe thin film solar cells. Although, thin film CdTe continues to be one of the leading materials for large-scale cost-effective production of photovoltaics, the efficiency of the CdTe solar cells have been stagnant for the last few years. This report describes and summarizes the results for this 3-year research project.

  17. P-type thin films transistors with solution-deposited lead sulfide films as semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Carrillo-Castillo, A.; Salas-Villasenor, A.; Mejia, I. [Department of Materials Science and Engineering, The University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Aguirre-Tostado, S. [Centro de Investigacion en Materiales Avanzados, S. C. Alianza Norte 202, Parque de Investigacion e Innovacion Tecnologica, Apodaca, Nuevo Leon, C.P. 666000 (Mexico); Gnade, B.E. [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Quevedo-Lopez, M.A., E-mail: mxq071000@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States)

    2012-01-31

    In this paper we demonstrate p-type thin film transistors fabricated with lead sulfide (PbS) as semiconductor deposited by chemical bath deposition methods. Crystallinity and morphology of the resulting PbS films were characterized using X-ray diffraction, atomic force microscopy and scanning electron microscopy. Devices were fabricated using photolithographic processes in a bottom gate configuration with Au as source and drain top contacts. Field effect mobility for as-fabricated devices was {approx} 0.09 cm{sup 2} V{sup -1} s{sup -1} whereas the mobility for devices annealed at 150 Degree-Sign C/h in forming gas increased up to {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Besides the thermal annealing, the entire fabrications process was maintained below 100 Degree-Sign C. The electrical performance of the PbS-thin film transistors was studied before and after the 150 Degree-Sign C anneal as well as a function of the PbS active layer thicknesses. - Highlights: Black-Right-Pointing-Pointer Thin film transistors with PbS as semiconductor deposited by chemical bath deposition. Black-Right-Pointing-Pointer Photolithography-based thin film transistors with PbS films at low temperatures. Black-Right-Pointing-Pointer Electron mobility for anneal-PbS devices of {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Black-Right-Pointing-Pointer Highest mobility reported in thin film transistors with PbS as the semiconductor.

  18. Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films

    International Nuclear Information System (INIS)

    Molybdenum thin films have been deposited on Ti/(100) Si substrates by dc sputtering. For process optimization, a design of experiments method was used with three input factors (target power, substrate temperature, and process gas flow). Deposition rate, resistivity, roughness, diffraction angle, and rocking curve width were analyzed as output responses using statistical analysis method. Subsequently, a process allowing the deposition of highly crystalline, smooth, and low resistivity Mo film was selected and tested against film thickness. The as-optimized sputtered molybdenum thin film was used as seeding electrode for the growth of highly c-axis textured AlN film by dc pulsed reactive sputtering

  19. Fabrication, characterisation, and optical applications of electrochemically deposited nanostructured IrOx films

    OpenAIRE

    Hu, Jin

    2008-01-01

    In this work, nanostructured iridium oxide films were fabricated by electrochemical deposition within a template made with polystyrene spheres on gold substrates. SEM pictures show that the nanostructured IrOx films have a very ordered hexagonal structure. To our knowledge, this is the first report of templated deposition of nanostructured IrOx films and only the 2nd of fabrication of templated deposition of nanostructured electrochromic metal oxides. The deposition solution was carried o...

  20. Technology support for high-throughput processing of thin-film CdTe PV modules: Annual technical report, Phase 1, 1 April 1998--31 March 1999

    Energy Technology Data Exchange (ETDEWEB)

    Rose, D.H.; Powell, R.C.; Grecu, D.; Jayamaha, U.; Hanak, J.J.; Bohland, J.; Smigielski, K.; Dorer, G.L.

    1999-10-25

    This report describes work performed by First Solar, L.L.C., during Phase 1 of this 3-year subcontract. The research effort of this subcontract is divided into four areas: (1) process and equipment development, (2) efficiency improvement, (3) characterization and analysis, and (4) environmental, health, and safety. As part of the process development effort, the output of the pilot-production facility was increased. More than 6,200 8-ft{sup 2} CdS/CdTe plates were produced during Phase 1--more than double the total number produced prior to Phase 1. This increase in pilot-production rate was accomplished without a loss in the PV conversion efficiency: the average total-area AM1.5 efficiency of sub-modules produced during the reporting period was 6.4%. Several measurement techniques, such as large-area measurement of CdS thickness, were developed to aid process improvement, and the vapor-transport deposition method was refined. CdTe thickness uniformity and reproducibility were improved. From a population of more than 1,100 plates, the mean standard deviation within a plate was 7.3% and the standard deviation of individual-plate averages was 6.8%. As part of the efficiency-improvement task, research was done on devices with thin-CdS and buffer layers. A cell with 13.9% efficiency was produced on a high-quality substrate, and higher than 12% efficiency was achieved with a cell with no CdS layer. A number of experiments were performed as part of the characterization and analysis task. The temperature dependence of CdTe modules was investigated; the power output was found to be relatively insensitive (<5%) to temperature in the 25 to 50 C range. As part of the characterization and analysis task, considerable effort was also given to reliability verification and improvement. The most carefully monitored array, located at the NREL, was found to have unchanged power output within the margin of error of measurement (5%) after 5 years in the field. The first round of National

  1. Liquid films and droplet deposition in a BWR fuel element

    International Nuclear Information System (INIS)

    In the upper part of boiling water reactors (BWR) the flow regime is dominated by a steam-water droplet flow with liquid films on the nuclear fuel rod, the so called (wispy) annular flow regime. The film thickness and liquid flow rate distribution around the fuel rod play an important role especially in regard to so called dryout, which is the main phenomenon limiting the thermal power of a fuel assembly. The deposition of droplets in the liquid film is important, because this process sustains the liquid film and delays dryout. Functional spacers with different vane shapes have been used in recent decades to enhance droplet deposition and thus create more favorable conditions for heat removal. In this thesis the behavior of liquid films and droplet deposition in the annular flow regime in BWR bundles is addressed by experiments in an adiabatic flow at nearly ambient pressure. The experimental setup consists of a vertical channel with the cross-section resembling a pair of neighboring subchannels of a fuel rod bundle. Within this double subchannel an annular flow is established with a gas-water mixture. The impact of functional spacers on the annular flow behavior is studied closely. Parameter variations comprise gas and liquid flow rates, gas density and spacer shape. The setup is instrumented with a newly developed liquid film sensor that measures the electrical conductance between electrodes flush to the wall with high temporal and spatial resolution. Advanced post-processing methods are used to investigate the dynamic behavior of liquid films and droplet deposition. The topic is also assessed numerically by means of single-phase Reynolds-Averaged-Navier-Stokes CFD simulations of the flow in the gas core. For this the commercial code STAR-CCM+ is used coupled with additional models for the liquid film distribution and droplet motion. The results of the experiments show that the liquid film is quite evenly distributed around the circumference of the fuel rods. The

  2. In-situ CdS/CdTe Heterojuntions Deposited by Pulsed Laser Deposition

    KAUST Repository

    Avila-Avendano, Jesus

    2016-04-09

    In this paper pulsed laser deposition (PLD) methods are used to study p-n CdTe/CdS heterojunctions fabricated in-situ. In-situ film deposition allows higher quality p-n interfaces by minimizing spurious contamination from the atmosphere. Morphologic and structural analyses were carried for CdTe films deposited on various substrates and different deposition conditions. The electrical characteristics and performance of the resulting p-n heterojunctions were studied as function of substrate and post-deposition anneal temperature. In-situ growth results on diodes with a rectification factor of ~ 105, an ideality factor < 2, and a reverse saturation current ~ 10-8 A. The carrier concentration in the CdTe film was in the range of ~ 1015 cm-3, as measured by C-V methods. The possible impact of sulfur diffusion from the CdS into the CdTe film is also investigated using High Resolution Rutherford Back-Scattering.

  3. Deposition of silicon oxide like films from HMDSO by means of atmospheric pressure microplasma jets: Study of deposition mechanisms

    CERN Document Server

    Reuter, R; Ellerweg, D; Arcos, T de los; von Keudell, A; Benedikt, J

    2011-01-01

    The deposition of thin SiOxCyH or SiOxHy films by means of atmospheric pressure microplasma jets with Helium / Hexamethyldisiloxane (HMDSO / O2) mixtures and the role of surface reactions for the film growth have been investigated. The growth rate and the carbon-content in the film are measured as a function of the O2 and HMDSO mixture in the gas flow. Two types of microplasma jets, one with a planar and one with a coaxial geometry, are used to study the deposition process. The very localised deposition on and treatment of the surface gives the opportunity to separate deposition and treatment processes by applying two jets on a rotating substrate. The etching of carbon at the surface and the increasing HMDSO depletion leading to an increasing deposition rate are both induced by admixing oxygen. Carbon free films can be deposited, even without addition of oxygen, and the main loss channels for carbon are surface reactions.

  4. Effects of Stoichiometry in Undoped CdTe Heteroepilayers on Si

    Energy Technology Data Exchange (ETDEWEB)

    Gessert, Timothy A.; Colegrove, Eric; Stafford, Brian; Gao, Wei; Sivananthan, Siva; Kuciauskas, Darius; Moutinho, Helio; Farrell, Stuart; Barnes, Teresa

    2015-06-14

    Crystalline CdTe layers have been grown heteroepitaxially onto crystalline Si substrates to establish material parameters needed for advanced photovoltaic (PV) device development and related simulation. These studies suggest that additional availability of the intrinsic anion (i.e., Te) during molecular beam epitaxy deposition can improve structural and optoelectronic quality of the epilayer and the interface between Si substrate and the epilayer. This is seen most notably for thin CdTe epitaxial films (<; ~10 micrometers). Although these observations are foundationally important, they are also relevant to envisioned high-performance multijunction II-VI alloy PV devices-where thin layers will be required to achieve production costs aligned with market constraints.

  5. Direct current magnetron sputter-deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Hoon, Jian-Wei [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Chan, Kah-Yoong, E-mail: kychan@mmu.edu.my [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Krishnasamy, Jegenathan; Tou, Teck-Yong [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Knipp, Dietmar [School of Engineering and Science, Jacobs University Bremen, 28759 Bremen (Germany)

    2011-01-15

    Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 deg. C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.

  6. Effects of deposition parameters on the properties of VO2 thin films

    Institute of Scientific and Technical Information of China (English)

    WANG Lixia; LI Jianping; GAO Xiaoguang; HE Xiuli

    2006-01-01

    The vanadium oxide thin films are deposited for microbolometers by radio frequency reactive sputtering method at room temperature. The effects of the oxygen partial pressure on the deposition rate, electrical properties and compositions of the films are discussed. The as-deposited VOx thin films with x value of nearly 2 are deposited by adjusting the oxygen partial pressure. After oxidation annealing of these films in air, the VO2 films with high temperature coefficients of resistivity (about - 49%/℃ ) and low resistivity can be obtained. The square resistances of the films are in the range of 100 kΩ/squ-300 kΩ/squ. All films are deposited at room temperature and annealed at 400℃, in which the compatibility between VOx deposition process and MEMS (micro electromechanical systems) is greatly improved.

  7. Plasma-polymerized SiOx deposition on polymer film surfaces for preparation of oxygen gas barrier polymeric films

    International Nuclear Information System (INIS)

    SiOx films were deposited on surfaces of three polymeric films, PET, PP, and Nylon; and their oxygen gas barrier properties were evaluated. To mitigate discrepancies between the deposited SiOx and polymer film, surface modification of polymer films was done, and how the surface modification could contribute to was discussed from the viewpoint of apparent activation energy for the permeation process. The SiOx deposition on the polymer film surfaces led to a large decrease in the oxygen permeation rate. Modification of polymer film surfaces by mans of the TMOS or Si-COOH coupling treatment in prior to the SiOx deposition was effective in decreasing the oxygen permeation rate. The cavity model is proposed as an oxygen permeation process through the SiOx-deposited Nylon film. From the proposed model, controlling the interface between the deposited SiOx film and the polymer film is emphasized to be a key factor to prepare SiOx-deposited polymer films with good oxygen gas barrier properties. (author)

  8. Tribological behavior of in situ Ag nanoparticles/polyelectrolyte composite molecular deposition films

    International Nuclear Information System (INIS)

    Multilayer polyelectrolyte films containing silver ions were obtained by molecular deposition method on a glass plate or a quartz substrate. The in situ Ag nanoparticles were synthesized in the multilayer polyelectrolyte films which were put into fresh NaBH4 aqueous solution. The structure and surface morphology of composite molecular deposition films were observed by UV-vis spectrophotometer, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Tribological characteristic was investigated by AFM and micro-tribometer. It was found that the in situ Ag nanoparticles/polyelectrolyte composite molecular deposition films have lower coefficient of friction and higher anti-wear life than pure polyelectrolyte molecular deposition films.

  9. Atomistic study of deposition process of Al thin film on Cu substrate

    International Nuclear Information System (INIS)

    In this paper we report molecular dynamics based atomistic simulations of deposition process of Al atoms onto Cu substrate and following nanoindentation process on that nanostructured material. Effects of incident energy on the morphology of deposited thin film and mechanical property of this nanostructured material are emphasized. The results reveal that the morphology of growing film is layer-by-layer-like at incident energy of 0.1-10 eV. The epitaxy mode of film growth is observed at incident energy below 1 eV, but film-mixing mode commences when incident energy increase to 10 eV accompanying with increased disorder of film structure, which improves quality of deposited thin film. Following indentation studies indicate deposited thin films pose lower stiffness than single crystal Al due to considerable amount of defects existed in them, but Cu substrate is strengthened by the interface generated from lattice mismatch between deposited Al thin film and Cu substrate.

  10. Deposition and consolidation of porous ceramic films for membrane separation

    DEFF Research Database (Denmark)

    Elmøe, Tobias Dokkedal; Tricoli, Antonio; Johannessen, Tue;

    The deposition of porous ceramic films for membrane separation can be done by several processes such as thermophoresis [1], dip-coating [2] and spray pyrolysis [3]. Here we present a high-speed method, in which ceramic nano-particles form a porous film by filtration on top of a porous ceramic...... and ignited by a supporting flame (methane and oxygen). The thickness of the deposited layer can be closely controlled by changing the a) particle concentration and b) the filtration time. Using a new method termed surface annealing [5]; we can consolidate the films on the surface by switching off.......E., Sahm, T., Gurlo, A., Barsan, N., Weimar, U., Sensors and Actuators B, 114, 283-295, 2006 [2] Cini, P., Blaha, S.R., Harold, M.P., Venkataraman, K., J. Membrane Sci., 55, 199-225, 1991 [3] Stoermer, A.O., Rupp, J.L.M., Gauckler, L.J., Solid State Ionics, In press, 2006 [4] Andersen, S.K., Johannessen, T...

  11. Substrate heating measurements in pulsed ion beam film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Olson, J.C.; Davis, H.A.; Rej, D.J.; Waganaar, W.J. [Los Alamos National Lab., NM (United States); Tallant, D.R. [Cornell Univ., Ithaca, NY (United States). Materials Science and Engineering Dept.; Thompson, M.O. [Sandia National Labs., Albuquerque, NM (United States)

    1995-05-01

    Diamond-like Carbon (DLC) films have been deposited at Los Alamos National Laboratory by pulsed ion beam ablation of graphite targets. The targets were illuminated by an intense beam of hydrogen, carbon, and oxygen ions at a fluence of 15-45 J/cm{sup 2}. Ion energies were on the order of 350 keV, with beam current rising to 35 kA over a 400 ns ion current pulse. Raman spectra of the deposited films indicate an increasing ratio of sp{sup 3} to sp{sup 2} bonding as the substrate is moved further away from the target and further off the target normal. Using a thin film platinum resistor at varying positions, we have measured the heating of the substrate surface due to the kinetic energy and heat of condensation of the ablated material. This information is used to determine if substrate heating is responsible for the lack of DLC in positions close to the target and near the target normal. Latest data and analysis will be presented.

  12. Cobalt cluster-assembled thin films deposited by low energy cluster beam deposition: Structural and magnetic investigations of deposited layers

    International Nuclear Information System (INIS)

    Cobalt cluster-assembled thin films were deposited on amorphous-carbon-coated copper grids and on silicon substrates at room temperature by low energy cluster beam deposition. Characterizations using high-resolution transmission electronic microscopy and atomic force microscopy reveal randomly stacked agglomerates of 9-11 nm diameter, which are themselves composed of small 3.6 nm diameter fcc cobalt clusters. The films are ferromagnetic up to room temperature and above, which implies that the clusters are exchange coupled. The approach to saturation is analyzed within the random anisotropy model. The values of the exchange coefficient A and the anisotropy constant K then derived are discussed. The temperature dependence of the coercivity below 100 K is discussed in terms of thermal activation effects. All results indicate that the fundamental entity governing the magnetic behaviors is constituted by the 9-11 nm diameter agglomerates rather than by the clusters themselves

  13. Electroless deposition, post annealing and characterization of nickel films on silicon

    Indian Academy of Sciences (India)

    Subir Sabharwal; Siddharth Palit; R B Tokas; A K Poswal; Sangeeta

    2008-10-01

    Electroless deposition of nickel (EN) films on -type silicon has been investigated under different process conditions. The interface between the film and substrate has been characterized for electrical properties by probing the contact resistances. X-ray diffraction and atomic force microscopy have been performed to obtain information about the structural and morphological details of the films. As a comparative study, nickel films have also been sputter deposited on silicon substrates. An as-deposited electroless film is observed to form non-ohmic contact while in a sputtered film prepared without the application of substrate heating, the formation of metal–insulating–semiconductor type junction is seen.

  14. Pure and Sn-doped ZnO films produced by pulsed laser deposition

    DEFF Research Database (Denmark)

    Holmelund, E.; Schou, Jørgen; Tougaard, S.;

    2002-01-01

    A new technique, metronome doping, has been used for doping of films during pulsed laser deposition (PLD). This technique makes it possible to dope continuously during film growth with different concentrations of a dopant in one deposition sequence. Films of pure and doped ZnO have been produced...

  15. Isothermal close-spaced vapour growth of CdTe for CdS/CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Vaccaro, P.O.; Saura, J. (Comision Nacional de Energia Atomica, San Carlos de Bariloche (Argentina). Centro Atomico Bariloche)

    1991-01-01

    CdS(n)/CdTe(p) thin-film solar cells with an efficiency of >10% have been prepared by several fabrication methods. These methods include close-spaced vapour transport and sintering. Sintering, usually preceded by screen printing, has been especially attractive owing to the simplicity of the equipment and the small amount of waste material. This method implies coating the substrate with a slurry prepared with the semiconductor powder, an adequate binder and a sintering aid. In this letter we report preliminary results that indicate that growth of CdTe film on the CdS substrate could occur through a vapour-phase mechanism during the sintering stage of CdS/CdTe cells. In order to prepare the cells, the CdTe layers were deposited on the CdS sintered layer using two methods: sintering and isothermal close-spaced vapour transport (ICSVT). CdCl{sub 2} was used as a sintering aid. The ICSVT method shows promise for the preparation of CDTe dense films on CdS substrates. The presence of CdCl{sub 2} in the slurries is important, but at the moment it is not clear how this affects the deposition process. (author).

  16. Deposition of highly (111)-oriented PZT thin films by using metal organic chemical deposition

    CERN Document Server

    Bu, K H; Choi, D K; Seong, W K; Kim, J D

    1999-01-01

    Lead zirconate titanate (PZT) thin films have been grown on Pt/Ta/SiNx/Si substrates by using metal organic chemical vapor deposition with Pb(C sub 2 H sub 5) sub 4 , Zr(O-t-C sub 4 H sub 9) sub 4 , and Ti(O-i-C sub 3 H sub 7) sub 4 as source materials and O sub 2 as an oxidizing gas. The Zr fraction in the thin films was controlled by varying the flow rate of the Zr source material. The crystal structure and the electrical properties were investigated as functions of the composition. X-ray diffraction analysis showed that at a certain range of Zr fraction, highly (111)-oriented PZT thin films with no pyrochlore phases were deposited. On the other hand, at low Zr fractions, there were peaks from Pb-oxide phases. At high Zr fractions, peaks from pyrochlore phase were seen. The films also showed good electrical properties, such as a high dielectric constant of more than 1200 and a low coercive voltage of 1.35 V.

  17. Pulsed laser deposition of organic semiconductor rubrene thin films

    Science.gov (United States)

    Grochowska, K.; Majumdar, S.; Laukkanen, P.; Majumdar, H. S.; Sawczak, M.; Śliwiński, G.

    2015-01-01

    Pulsed Laser Deposition (PLD) technique is applied to produce organic semiconductor (OS) rubrene thin film for spintronics applications. The use of organic material for spintronics is motivated by the advantages such as long spin diffusion length due to low spin-orbit and hyperfine coupling1,2, chemical tuning of electronic functionality, easy structural modifications, ability of self-assembly and mechanical flexibility3 etc. However, a major drawback of OS is its low mobility compared to inorganic semiconductors. The PLD growth of rubrene aims on fabricating OS films under more controlled environment to achieve higher crystalline order to improve its mobility and spin coherence length. Among organic materials, rubrene reveals the highest hole mobility - up to 40 cm2/(V•s) and can be exploited in organic light-emitting diodes (OLEDs) or field-effect transistors (OFETs) 4. In this work the rubrene thin films are produced from hardened pellets in vacuum using Nd:YAG pulsed laser operated at 1064 nm, 2 Hz and energy fluence around 0.2 J/cm2. For the reference rubrene samples on SiO2 glass the AFM data reveal continuous 5-7 nm thick films. The amorphous structures are confirmed by XRD measurements and also Raman spectra which show signatures of both tetracene and phenyl bands and a broadband at 1373 cm-1. The obtained results indicate that continuous, defect-free rubrene films can be prepared by means of PLD for investigation of the spin polarization properties of organic-inorganic hybrids. Further studies are on the way to improve crystalline qualities of the rubrene films for less grain boundary related defects and improved mobility and spin diffusion length.

  18. Vapor deposition of polystyrene thin films by intense laser vibrational excitation

    DEFF Research Database (Denmark)

    Bubb, D.M.; Papantonakis, M.R.; Horwitz, J.S.;

    2002-01-01

    Polystyrene films were deposited using resonant infrared pulsed laser depositions (RIR-PLD). Thin films were grown on Si(1 1 1) wafers and NaCl substrates and analyzed by Fourier transform infrared spectroscopy (FTIR) and gel permeation chromatography (GPC). The depositions were carried out...

  19. Properties of alumina films by atmospheric pressure metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Corbach, van H.D.; Fransen, T.; Gellings, P.J.

    1994-01-01

    Thin alumina films were deposited at low temperatures (290–420°C) on stainless steel, type AISI 304. The deposition process was carried out in nitrogen by metal-organic chemical vapour deposition using aluminum tri-sec-butoxide. The film properties including the protection of the underlying substrat

  20. Thin nanocrystalline zirconia films prepared by pulsed laser deposition

    Science.gov (United States)

    Dikovska, A. Og; Atanasova, G. B.; Avdeev, G. V.; Strijkova, V. Y.

    2016-03-01

    In the present work, thin zirconia films were prepared by pulsed laser deposition at different substrate temperatures and oxygen partial pressures. The substrate temperature was varied from 400 °C to 600 °C, and the oxygen pressure, from 0.01 to 0.05 mbar. The effect was investigated of the substrate temperature and oxygen pressure on the formation of m-zirconia and t-zirconia phases.The formation of a cubic phase of ZrO2 by using targets doped with 3 and 8 mol % content Y2O3 was also investigated. The variation in the optical properties was studied and discussed in relation with the zirconia films' microstructure.

  1. Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments

    International Nuclear Information System (INIS)

    Using a molecular dynamics model the crystallinity of MgxAlyOz thin films with a variation in the stoichiometry of the thin film is studied at operating conditions similar to the experimental operating conditions of a dual magnetron sputter deposition system. The films are deposited on a crystalline or amorphous substrate. The Mg metal content in the film ranged from 100% (i.e. MgO film) to 0% (i.e. Al2O3 film). The radial distribution function and density of the films are calculated. The results are compared with x-ray diffraction and transmission electron microscopy analyses of experimentally deposited thin films by the dual magnetron reactive sputtering process. Both simulation and experimental results show that the structure of the Mg-Al-O film varies from crystalline to amorphous when the Mg concentration decreases. It seems that the crystalline Mg-Al-O films have a MgO structure with Al atoms in between.

  2. Preparation of ZnS thin films by the pulsed electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Fathy, Naglaa; Kobayashi, Ryohei; Ichimura, Masaya

    2004-03-25

    We deposited ZnS thin films on Sn-doped In{sub 2}O{sub 3}-coated glass substrate using normal and pulsed electrochemical deposition (ECD) from aqueous solutions containing Na{sub 2}S{sub 2}O{sub 3} and ZnSO{sub 4} with two different compositions. Generally, the films deposited using pulsed deposition has much better surface morphology and optical properties than those deposited by normal ECD. The film deposited from the ZnSO{sub 4}-rich solution was of stoichiometric composition and after 300 deg. C annealing gives high transparency.

  3. Dependence of electro-optical properties on the deposition conditions of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Lately, there has been a sharp increase in the publication of papers on chemical bath deposition of CdS thin films and related materials due to successful results obtained using this method to fabricate CdS thin-film buffer layers for CuInSe{sub 2}- and CdTe-based polycrystalline thin-film solar cells. Generally, these papers focus on previously proposed methods of studying film characteristics without a systematic study of the influence of deposition conditions on film characteristics. In this paper the authors present an exhaustive study of the chemical bath-deposited CdS thin films electro-optical properties dependence on deposition variables. The authors propose not only a set of conditions for obtaining CdS thin films by this method but additionally, suitable deposition process conditions for certain application requirements, such as buffer layers for thin-film solar cells. The observed electro-optical characteristics dependence on the deposition variables corroborates the chemical mechanism that they proposed previously for this process.

  4. Mobility activation in thermally deposited CdSe thin films

    Indian Academy of Sciences (India)

    Kangkan Sarmah; Ranjan Sarma

    2009-08-01

    Effect of illumination on mobility has been studied from the photocurrent decay characteristics of thermally evaporated CdSe thin films deposited on suitably cleaned glass substrate held at elevated substrate temperatures. The study indicates that the mobilities of the carriers of different trap levels are activated due to the energy of incident illumination, which results in the existence of two distinct trap levels. In each trap depth the energy of the trap increases linearly. It infers that there is a linear distribution of traps of different energies below the conduction band.

  5. Radio frequency and microwave plasma for optical thin film deposition

    International Nuclear Information System (INIS)

    For the next generation of fusion lasers reflecting mirrors with laser damage thresholds of at least 40 J/cm2 for 10 ns laser pulses at 1.064 μm are needed. Up to now, no deposition technique has been developed to produce such mirrors. Best R ampersand D-values realized today are around 30 J/cm2 for e-beam evaporated mirrors. R ampersand D on conventional e-beam coating processes over the last 10 years has come up with marginal improvements in laser damage thresholds only. However, new technologies, like PICVD developed for the fabrication of ultra-low loss fiber preforms, seem to offer the potential to solve this problem. It is well known that fused silica produced by CVD processes can have laser damage thresholds as high as 80 J/cm2. However, the thickness of a single deposited film is in the μm-range for most of the CVD processes used for preform manufacturing; since interference optics need films in theλ/4n range the use of preform-fabrication processes for the purpose of interference mirror fabrication is limited to a few plasma based CVD technologies, namely PCVD. Especially PICVD is a very powerful technology to fabricate thin film multilayers for interference mirrors, because this technique is able to produce films down to monolayer thickness with nearly perfect stoichiometry and morphology. In first and preliminary experiments the usual deposition in a circular tube at high temperatures has been used for simplicity. However, to produce large area high quality laser mirrors this principle know-how has to be transferred from circular to planar geometry. Experiments showed, that there may be some limitations with respect to the homogeneity of a planar deposition using microwave excitation for the plasma. Therefore experiments have been performed in parallel with both RF and microwave excitation for comparison. In the following we will restrict ourselves to the description and discussions of the planar processes

  6. Growth of Ge films by cluster beam deposition

    CERN Document Server

    Xu, J L; Feng, J Y

    2002-01-01

    Ge epitaxial layers with reasonable quality were grown on the Si(1 1 1) substrates by cluster beam deposition (CBD) process. The growth temperature plays a dominant role in the epitaxial growth of Ge films. The substrate temperature for epitaxial growth is about 500 deg. C, which is lower than the reported critical temperature of Ge epitaxial growth by MBE and CVD. A stress induced phase transition of Ge lattice from cubic to tetragonal is also observed in the CBD process, and the mechanism is discussed.

  7. Innovative sputtering techniques for CIS and CdTe submodule fabrication

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, J.M.; Misra, M.S.; Lanning, B. (Martin Marietta Aerospace, Denver, CO (United States). Astronautics Group)

    1993-03-01

    This report describes work done during Phase 1 of the subject subcontract. The subcontract was designed to study innovative deposition techniques, such as the rotating cylindrical magnetron sputtering system and electrodeposition for large-area, low-cost copper indium diselenide (CIS) and cadmium telluride (CdTe) devices. A key issue for photovoltaics (PV) in terrestrial and future space applications is producibility, particularly for applications using a large quantity of PV. Among the concerns for fabrication of polycrystalline thin-film PV, such as CIS and CdTe, are production volume, cost, and minimization of waste. Both rotating cylindrical magnetron (C-Mag[trademark]) sputtering and electrodeposition have tremendous potential for the fabrication of polycrystalline thin-film PV due to scaleability, efficient utilization of source materials, and inherently higher deposition rates. In the case of sputtering, the unique geometry of the C-Mae facilitates innovative cosputtering and reactive sputtering that could lead to greater throughput reduced health and safety risks, and, ultimately, lower fabrication cost. Electrodeposited films appear to be adherent and comparable with low-cost fabrication techniques. Phase I involved the initial film and device fabrication using the two techniques mentioned herein. Devices were tested by both internal facilities, as well as NREL and ISET.

  8. Fabrication and characterization of indium sulfide thin films deposited on SAMs modified substrates surfaces by chemical bath deposition

    International Nuclear Information System (INIS)

    In an effort to explore the optoelectronic properties of nanostructured indium sulfide (In2S3) thin films for a wide range of applications, the In2S3 thin films were successfully deposited on the APTS layers (-NH2-terminated) modified ITO glass substrates using the chemical bath deposition technique. The surface morphology, structure and composition of the resultant In2S3 thin films were characterized by FESEM, XRD, and XPS, respectively. Also, the correlations between the optical properties, photocurrent response and the thickness of thin films were established. According to the different deposition mechanisms on the varying SAMs terminational groups, the positive and negative micropatterned In2S3 thin films were successfully fabricated on modified Si substrates surface combining with the ultraviolet lithography process. This offers an attractive opportunity to fabricate patterned In2S3 thin films for controlling the spatial positioning of functional materials in microsystems.

  9. Characterization of Bi-Catalyzed Nanocrystalline CdTe Thin Films Prepared by Close Spaced Sublimation%近距离升华法制备Bi催化纳米晶CdTe薄膜的表征

    Institute of Scientific and Technical Information of China (English)

    李锦; 尚飞; 郑毓峰; 孙言飞; 简基康; 吴荣

    2009-01-01

    采用近距离升华法(Close-Spaced-Sublimation,CSS)引入Bi催化剂成功制备出了具有纳米线、近阵列排布的纳米棒等形貌的纳米晶CdTe薄膜.并利用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外可见分光光度计等研究了薄膜的结构、表面形貌和光学性能.讨论了CdTe纳米结构可能的生长机制.%Bi-catalyzed nanocrystalline CdTe films were prepared by close spaced sublimation (CSS) technique successfully.These nanocrystalline CdTe films had surface appearance of nanowires or a similar array arrangement nanorod.The structure,the surface topograph and the optical properties of these films were studied using X-ray diffraction(XRD),scanning electron microscopy(SEM) and ultroviolet-visible (UV-VIS) spectrophotometer.And the possible growth mechanisms of these nanostructures were discussed.

  10. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.

    Science.gov (United States)

    Yan, Baojun; Liu, Shulin; Heng, Yuekun

    2015-01-01

    Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO:Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO:Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.

  11. Fabrication of solid-state thin-film batteries using LiMnPO4 thin films deposited by pulsed laser deposition

    International Nuclear Information System (INIS)

    Solid-state thin-film batteries using LiMnPO4 thin films as positive electrodes were fabricated and the electrochemical properties were characterized. The LiMnPO4 thin films were deposited on Pt coated glass substrates by pulsed laser deposition. In-plane X-ray diffraction revealed that the LiMnPO4 thin films were well crystallized and may have a texture with a (020) orientation. The deposition conditions were optimized; the substrate temperature was 600 °C and the argon pressure was 100 Pa. The electrochemical measurements indicate that the LiMnPO4 films show charge and discharge peaks at 4.3 V and 4.1 V, respectively. The electrical conductivity of the LiMnPO4 film was measured by impedance spectroscopy to be 2 × 10−11 S cm−1 at room temperature. The solid-state thin-film batteries that show excellent cycle stability were fabricated using the LiMnPO4 thin film. Moreover, the chemical diffusion of the LiMnPO4 thin film was studied by cyclic voltammetry. The chemical diffusion coefficient of the LiMnPO4 thin film is estimated to be 3.0 × 10−17 cm2 s−1, which is approximately four orders magnitude smaller than the LiFePO4 thin films, and the capacity of the thin-film battery was gradually increased for 500 cycles. - Highlights: • Olivine-type LiMnPO4 thin-films were fabricated by pulsed laser deposition. • The electrochemical properties were characterized by using solid-state thin-film batteries. • Chemical diffusion coefficient of LiMnPO4 thin film was estimated by cyclic voltammetry. • Thin-film batteries, Li/Li3PO4/LiMnPO4, show excellent cycle stability up to 500 cycles

  12. Oxygen partial pressure dependent optical properties of glancing angle deposited (GLAD) Ta2O5 films deposited by magnetron sputtering

    Science.gov (United States)

    Tripathi, S.; Haque, S. Maidul; Rao, K. Divakar; Misal, J. S.; Pratap, C.; Sahoo, N. K.

    2016-05-01

    Experiments were carried out on Ta2O5 oxide thin films by asymmetric bipolar pulsed DC magnetron sputtering using a new hybrid combination of conventional (normal incidence) deposition and glancing angle deposition (GLAD) geometries. The films were prepared with varying O2 partial pressure. The ellipsometry characterization reveals a systematic variation in refractive index, which decreased from 2.2 in the normal films to an average 1.78 in the GLAD films. The bandgap of these GLAD films is slightly higher as compared to normal films. Overall transmission of the GLAD films is increased is by ~ 15 % implying a reduction in the refractive index for potential optical filtering device applications. The results were further supported by X-ray reflectivity measurements which show an effective double layer structure in GLAD consisting of layers with different densities of the same Ta2O5 material.

  13. Temperature dependent electroreflectance study of CdTe solar cells

    International Nuclear Information System (INIS)

    Cadmium telluride is a promising material for large scale photovoltaic applications. In this paper we study CdS/CdTe heterojunction solar cells with electroreflectance spectroscopy. Both CdS and CdTe layers in solar cells were grown sequentially without intermediate processing by the close-space sublimation method. Electroreflectance measurements were performed in the temperature range of T = 100–300 K. Two solar cells were investigated with conversion efficiencies of 4.1% and 9.6%. The main focus in this work was to study the temperature dependent behavior of the broadening parameter and the bandgap energy of CdTe thin film in solar cells. Room temperature bandgap values of CdTe were Eg = 1.499 eV and Eg = 1.481 eV for higher and lower efficiency solar cells, respectively. Measured bandgap energies are lower than for single crystal CdTe. The formation of CdTe1−xSx solid solution layer on the surface of CdTe is proposed as a possible cause of lower bandgap energies. - Highlights: ► Temperature dependent electroreflectance measurements of CdS/CdTe solar cells ► Investigation of junction properties between CdS and CdTe ► Formation of CdTe1− xSx solid solution layer in the junction area

  14. The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties

    OpenAIRE

    Velaphi Msomi; Oaisin Nemraoui

    2010-01-01

    Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, ind...

  15. Piezoelectric film electro-deposition for optical fiber sensor with ZnO coating

    Institute of Scientific and Technical Information of China (English)

    Li Zhou; Ping Gu; Ya Zhou

    2008-01-01

    The piezoelectric film electro-deposition for optical fiber sensor with ZnO coating is studied. The zinc oxide plating film is made on the copper surface directly by cathodic electro-deposition in the Zn(NO3)2 single salt aqueous solution systems. The influences of main experimental conditions on the properties of ZnO thin film in the electro-deposition processes are analyzed and a stable, practical and economic technique is obtained.

  16. Characteristics of deposition process of thin films by ion-beam evaporation

    International Nuclear Information System (INIS)

    Intense pulsed ion-beam evaporation (IBE) has been proposed as one of the new techniques for the preparation of thin films. To understand the basic process of thin film deposition, the energy deposition on the substrate surface by ablation plasma was measured by using calorimetric technique. The characteristics of prepared thin films were studied with deposition energy. In addition, the substrate temperature was calculated, based on the experimental results, by using one-dimensional simulations only considering heat conduction. (author)

  17. Atomic layer deposition of ZnO thin films and dot structures

    International Nuclear Information System (INIS)

    Successful growth of thin films and quantum dots of ZnO by atomic layer deposition (ALD) is reported. Properties of ZnO films produced by four different ALD-procedures and by oxidation of ALD-grown ZnS films are discussed. The use of thin ZnO films as buffer layers for GaN deposition is also shortly described. (author)

  18. Characterisation of CdO thin films deposited by activated reactive evaporation

    Science.gov (United States)

    Ramakrishna Reddy, K. T.; Sravani, C.; Miles, R. W.

    1998-02-01

    The paper describes the preparation of cadmium oxide thin films produced by "activated reactive evaporation" onto heated glass substrates. The structural, electrical and optical properties of the deposited films were investigated and the effect of substrate temperature on the different physical properties of the films investigated. Highly conducting, polycrystalline CdO films with good transmittances were prepared by controlling the deposition temperature. These layers can be used to produce CdO/CdTe solar cells with efficiencies > 7%.

  19. Deposition and Surface Modification of Low-k Thin Films For ILD Application In ULSI Circuits

    Directory of Open Access Journals (Sweden)

    Y.S. Mhaisagar

    2011-01-01

    Full Text Available The low-k thin films have been deposited successfully by sol gel technique using tetraethylorthosilicate (TEOS precursor and the surface of deposited thin films have been modified by wet chemical treatment using trimethylcholorsilane (TMCS and hexane solution with 15 % volume ratio to remove the hydroxyl groups from the surface of deposited low-k thin films. The characterization of the as deposited and surface modified low-k thin films has been carried out by Ellipsometer, Fourier transform infrared (FTIR spectrometer, and contact angle meter. For the determination of the dielectric constant of the deposited thin film the metal –insulator-semiconductor (MIS structure was formed by depositing the Aluminium (Al metal on the low-k thin film. Further the capacitance-voltage curve of the MIS structure has been obtained at 1 MHz frequency. The dielectric constant of the as deposited thin film is found to be 2.15. The lowering of O-H peaks and appearance of CH3 peaks in FTIR spectra confirms the surface modification of SiO2 films. The contact angle of the deposited thin film is changed from 83.3° to 104° after surface modification that validates the transformation of thin film surface from hydrophilic to hydrophobic after the surface modification treatment.

  20. Second harmonic generation in ZnO thin films fabricated by metalorganic chemical vapor deposition

    Science.gov (United States)

    Liu, C. Y.; Zhang, B. P.; Binh, N. T.; Segawa, Y.

    2004-07-01

    Second harmonic generation (SHG) from ZnO thin films fabricated by metalorganic chemical vapor deposition (MOCVD) technique was carried out. By comparing the second harmonic signal generated in a series of ZnO films with different deposition temperatures, we conclude that a significant part of second harmonic signal is generated at the film deposited with appropriate temperature. The second-order susceptibility tensor χ(2)zzz=9.2 pm/V was deduced for a film deposited at 250 °C.

  1. Packaging barrier films deposited on PET by PECVD using a new high density plasma source

    International Nuclear Information System (INIS)

    Barrier films for packaging applications are deposited by plasma enhanced chemical vapor deposition (PECVD) on PET film using a new, high density plasma source. The new source, termed the Penning Discharge Plasma source, implements a novel magnetic field/electrode configuration that confines the electron Hall current in an endless loop adjacent to the substrate. By confining the Hall current, a dense, uniform plasma is created and sustained over wide substrates. The result is high rate deposition at low substrate temperatures. The water vapor permeation of SiO2 barrier films is reported as well as deposition rate, coating thickness and other film properties

  2. Pulsed Laser Deposition of Er doped tellurite films on large area

    Energy Technology Data Exchange (ETDEWEB)

    Bouazaoui, M [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Capoen, B [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Caricato, A P [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Chiasera, A [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Fazzi, A [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Ferrari, M [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Leggieri, G [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Martino, M [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Mattarelli, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Montagna, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Romano, F [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Tunno, T [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Turrel, S [Universite des Sciences et Technologies de Lille, Laboratoire de Spectrochimie Infrarouge et Raman, LASIR - UMR 8516 du CNRS - Bat C5 - 59655 - Villeneuve d' Ascq cedex (France); Vishnubhatla, K [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy)

    2007-04-15

    Thin films of Er{sup 3+}-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O{sub 2} pressure (5, 10 Pa) and at different substrate temperatures (RT, 100deg. C and 200deg. C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions.

  3. Nanometer-thick copper films grown by thermal atomic layer deposition

    International Nuclear Information System (INIS)

    Because of the superior properties of copper, it has been of great interest as a conducting material to replace aluminum in device manufacturing. In this study, we investigated the influence of substrate temperature, film thickness, and rapid thermal annealing (RTA) on the deposition of Cu films of thickness less than 10 nm. Compared to thicker films, the electrical properties of nanometer-thick films were found to be very sensitive to the deposition temperature. Further, we determined the optimal deposition temperature to obtain low-resistivity nanometer-thick Cu films. The Cu films were deposited with island-type growth, and the interconnection between grains plays a major role in the resistivity of the films. We also determined the critical thickness at which Cu films exhibit continuous growth as 8 nm. After RTA, the film color darkened, electron scattering became weak, and the resistivity reduced more than 20% with annealing at 300–350 °C, because of the growth of Cu grains. The results of this study indicate that thermal ALD can be used in conjunction with RTA to produce low-resistivity Cu thin films, the thickness, uniformity, and conformality of which can be easily controlled. - Highlights: • Resistance of nanometer-thick Cu film was sensitive to deposition temperature. • Optimal temperature deposition was determined to obtain low-resistivity. • Critical thickness at which Cu films exhibit continuous growth was determined. • Resistivity reduced with annealing at 300–350 °C

  4. Photoluminescence and Electroluminescence Properties of CdTe Nanoparticles in Conjugated Polymer Hosts

    Institute of Scientific and Technical Information of China (English)

    GUO, Fengqi; XIE, Puhui

    2009-01-01

    The photoinduced energy transfer process from conjugated polymer (PPE4+) to CdTe nanocrystals was found both in solutions and in thin films by a fluorescence spectroscopic technique. Films of PPE4+ blended with CdTe-2 nanocrystals were formed by an electrostatic layer-by-layer assembly technique. Light emitting diodes were fabricated using CdTe-2 as an emitter in PPE4+ host. PPE4+ works as a molecular wire in the energy transfer process from the polymer to the CdTe-2 nanocrystals.

  5. Properties of nitrogen doped silicon films deposited by low-pressure chemical vapor deposition from silane and ammonia

    OpenAIRE

    Temple Boyer, Pierre; Jalabert, L.; Masarotto, L.; Alay, Josep Lluís; Morante i Lleonart, Joan Ramon

    2000-01-01

    Nitrogen doped silicon (NIDOS) films have been deposited by low-pressure chemical vapor deposition from silane SiH4 and ammonia NH3 at high temperature (750°C) and the influences of the NH3/SiH4 gas ratio on the films deposition rate, refractive index, stoichiometry, microstructure, electrical conductivity, and thermomechanical stress are studied. The chemical species derived from silylene SiH2 into the gaseous phase are shown to be responsible for the deposition of NIDOS and/or (silicon rich...

  6. The effects of deuteration on the nanostructured zirconium films deposited by pulsed laser deposition for nuclear fusion applications

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Wei, E-mail: liuweizigong@163.com; Wen, Chengwei; Liu, Qiong; Mao, Li; Zhou, Xiaosong; Long, Xinggui, E-mail: sculong@163.com; Peng, Shuming

    2015-06-15

    Highlights: • Zirconium films deposited on Al{sub 2}O{sub 3} (0 0 0 1) substrate by PLD are obtained. • The effects of deuterium on the resistivity and specular reflectivity of Zr films are investigated. • The results will be useful to optimize the synthesis conditions for the First Mirror application in fusion devices. - Abstract: In this paper, zirconium films have been deposited on Al{sub 2}O{sub 3} (0 0 0 1) substrates by pulsed laser deposition (PLD) and then transferred to deuterium atmospheres. We find that the formation of Zr{sub 0.38}D{sub 0.62} is under the deuterated temperatures of 923 K. The surface morphologies, electrical features and optical properties of as-grown zirconium films and zirconium deuteride films are systematically investigated as a function of three pulse repetition rates. It is found that the zirconium films show very smooth surfaces and high specular reflectivity. Moreover, exposure of the as-deposited zirconium films to deuterium atmospheres revealed that some pits formed on the surface of films. These defects induced by deuterium make the specular reflectivity and resistance of films change. The results of our investigation will be useful to optimize the environmental conditions for the First Mirror application in fusion devices.

  7. Electrodeposition of CdTe by potentiostatic and periodic pulse techniques

    Energy Technology Data Exchange (ETDEWEB)

    Moorthy Babu, S.; Dhanasekaran, R.; Ramasamy, P. (Crystal Growth Centre, Anna Univ., Madras (India))

    1991-07-15

    Cadmium telluride was electrodeposited from an aqueous solution containing the species CdCl{sub 2} and TeO{sub 2} by potentiostatic and periodic pulse techniques. The effect of different parameters such as concentration of the individual species, hydrogen ion concentration, applied potential and temperature are analysed to obtain optimum conditions for codeposition. X-ray diffractograms, X-ray microprobe analysis, scanning electron microscopy and voltammetry were employed to understand the crystalline nature, elemental composition and surface properties of the deposited films. A theoretical model has been developed for the electrodeposition of CdTe to understand the mechanism involved in the process. The results are discussed. (orig.).

  8. Characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double-discharge system

    International Nuclear Information System (INIS)

    SiOX thin films were deposited using a gas mixture of hexamethyldisilazane (HMDS)/O2/He/Ar from a remote-type dielectric barrier discharges (DBD) source, with/without the additional direct-type DBD just above the substrate (double discharge), and the effect of the double discharge on the characteristics of the SiOX thin film was investigated. The increase of HMDS flow rate and the decrease of oxygen flow rate in the gas mixture increased the SiOX-thin-film deposition rate. The improvement of the mechanical properties for SiOX film, in addition to the increase of deposition rate, is believed to be related not only to the higher gas dissociation because of the higher power deposition but also to the lesser recombination of oxygen atoms and dissociated HMDS due to the shorter diffusion length to the substrate.

  9. Surface-mediated structural transformation in CdTe nanoparticles dispersed in SiO2 thin films

    Science.gov (United States)

    Dayal, P. Babu; Mehta, B. R.; Aparna, Y.; Shivaprasad, S. M.

    2002-11-01

    Cadmium telluride nanoparticles dispersed in silicon dioxide thin films have been grown by magnetron sputtering technique followed by thermal annealing. The effect of thermal annealing conditions on the structure of the surface layer and the nanoparticle core has been studied. A structural transformation in the nanoparticle core mediated solely by surface effects has been observed for the first time in any nanoparticle system. The presence of a crystalline cadmium tellurium oxide layer modifies the crystal structure of the cadmium telluride nanoparticle core by introducing a large concentration of stacking faults.

  10. Radiative and interfacial recombination in CdTe heterostructures

    International Nuclear Information System (INIS)

    Double heterostructures (DH) were produced consisting of a CdTe film between two wide band gap barriers of CdMgTe alloy. A combined method was developed to quantify radiative and non-radiative recombination rates by examining the dependence of photoluminescence (PL) on both excitation intensity and time. The measured PL characteristics, and the interface state density extracted by modeling, indicate that the radiative efficiency of CdMgTe/CdTe DHs is comparable to that of AlGaAs/GaAs DHs, with interface state densities in the low 1010 cm−2 and carrier lifetimes as long as 240 ns. The radiative recombination coefficient of CdTe is found to be near 10−10 cm3s−1. CdTe film growth on bulk CdTe substrates resulted in a homoepitaxial interface layer with a high non-radiative recombination rate

  11. Photocatalytic activity of tin-doped TiO{sub 2} film deposited via aerosol assisted chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Chua, Chin Sheng, E-mail: cschua@simtech.a-star.edu.sg [School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798 (Singapore); Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075 (Singapore); Tan, Ooi Kiang; Tse, Man Siu [School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue, 639798 (Singapore); Ding, Xingzhao [Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075 (Singapore)

    2013-10-01

    Tin-doped TiO{sub 2} films are deposited via aerosol assisted chemical vapor deposition using a precursor mixture composing of titanium tetraisopropoxide and tetrabutyl tin. The amount of tin doping in the deposited films is controlled by the volume % concentration ratio of tetrabutyl tin over titanium tetraisopropoxide in the mixed precursor solution. X-ray diffraction analysis results reveal that the as-deposited films are composed of pure anatase TiO{sub 2} phase. Red-shift in the absorbance spectra is observed attributed to the introduction of Sn{sup 4+} band states below the conduction band of TiO{sub 2}. The effect of tin doping on the photocatalytic property of TiO{sub 2} films is studied through the degradation of stearic acid under UV light illumination. It is found that there is a 10% enhancement on the degradation rate of stearic acid for the film with 3.8% tin doping in comparison with pure TiO{sub 2} film. This improvement of photocatalytic performance with tin incorporation could be ascribed to the reduction of electron-hole recombination rate through charge separation and an increased amount of OH radicals which are crucial for the degradation of stearic acid. Further increase in tin doping results in the formation of recombination site and large anatase grains, which leads to a decrease in the degradation rate. - Highlights: ► Deposition of tin-doped TiO{sub 2} film via aerosol assisted chemical vapor depositionDeposited anatase films show red-shifted in UV–vis spectrum with tin-dopants. ► Photoactivity improves at low tin concentration but reduces at higher concentration. ► Improvement in photoactivity due to bandgap narrowing from Sn{sup 4+} band states ► Maximum photoactivity achieved occurs for films with 3.8% tin doping.

  12. Ion-sputtering deposition of Ca-P-O films for microscopic imaging of osteoblast cells

    Energy Technology Data Exchange (ETDEWEB)

    Ananda Sagari, A.R. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)]. E-mail: ananda.sagari@phys.jyu.fi; Lautaret, Claire [ENSICAEN, 6 Boulevard Marechal Juin, F-14050 CAEN Cedex 04 (France); Gorelick, Sergey [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Laitinen, Mikko [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Rahkila, Paavo [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Putkonen, Matti [Beneq Oy, Ensimmaeinen savu, FI-01510 Vantaa (Finland); Arstila, Kai [Instituut voor Kern- en Stralingsfysica, K.U.Leuven, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Sajavaara, Timo [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Cheng, Sulin [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Whitlow, Harry J. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)

    2007-08-15

    An ion-beam sputtering technique was used to produce Ca-P-O films on borosilicate glass at room temperature from hydroxyapatite targets using nitrogen, argon and krypton beams at different acceleration voltages. The sputtering target was pressed from high purity hydroxyapatite powder or mixture of high purity hydroxyapatite powder and red phosphorus in order to optimise the film composition. The film composition, determined using time-of-flight elastic recoil detection analysis (TOF-ERDA), was found to be strongly dependent on the ion energy used for deposition. By extra doping of the target with P the correct Ca/P atomic ratio in the deposited films was reached. The films deposited on Si were amorphous even after annealing at 800 deg, C. The biocompatibility of the films was investigated using osteoblast-like cells. The film deposited under optimal conditions exhibited dendritic growth, indicative of more realistic chemical signalling than for other substratum e.g. polystyrene or plain glass.

  13. Characterization of thin CeO{sub 2} films electrochemically deposited on HOPG

    Energy Technology Data Exchange (ETDEWEB)

    Faisal, Firas [Lehrstuhl für Physikalische Chemie II, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstrasse 3, 91058 Erlangen (Germany); Toghan, Arafat, E-mail: arafat.toghan@yahoo.com [Lehrstuhl für Physikalische Chemie II, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstrasse 3, 91058 Erlangen (Germany); Chemistry Department, Faculty of Science, South Valley University, 83523 Qena (Egypt); Khalakhan, Ivan; Vorokhta, Mykhailo; Matolin, Vladimír [Department of Surface and Plasma Science, Charles University in Prague, V Holešovičkách 747/2, 180 00 Prague 8 (Czech Republic); Libuda, Jörg [Lehrstuhl für Physikalische Chemie II, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstrasse 3, 91058 Erlangen (Germany); Erlangen Catalysis Resource Center, Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstrasse 3, 91058 Erlangen (Germany)

    2015-09-30

    Graphical abstract: - Highlights: • Preparation of proton exchange membrane fuel cells catalyst using electrochemical thin film deposition. • Electrodeposition thin films of CeO{sub 2} on HOPG substrates. • The samples were characterized by in-situ AFM and ex-situ XPS. • XPS results reveal that the electrochemically deposited cerium oxide films are stoichiometric. • Exposing the films to ambient air, cracking structures are formed. - Abstract: Electrodeposition is widely used for industrial applications to deposit thin films, coatings, and adhesion layers. Herein, CeO{sub 2} thin films were deposited on a highly oriented pyrolytic graphite (HOPG) substrate by cathodic electrodeposition. The influence of the deposition parameters on the yield and on the film morphology is studied and discussed. Morphology and composition of the electrodeposited films were characterized by in-situ atomic force microscopy (AFM), scanning electron microscopy (SEM), Energy Dispersive X-ray spectroscopy (EDX), and X-ray photoelectron spectroscopy (XPS). By AFM we show that the thickness of CeO{sub 2} films can be controlled via the Ce{sup 3+} concentration in solution and the deposition time. After exposing the films to ambient air, cracking structures are formed, which were analyzed by AFM in detail. The chemical composition of the deposits was analyzed by XPS indicating the formation of nearly stoichiometric CeO{sub 2}.

  14. Aerosol assisted chemical vapor deposition using nanoparticle precursors: a route to nanocomposite thin films.

    Science.gov (United States)

    Palgrave, Robert G; Parkin, Ivan P

    2006-02-01

    Gold nanoparticle and gold/semiconductor nanocomposite thin films have been deposited using aerosol assisted chemical vapor deposition (CVD). A preformed gold colloid in toluene was used as a precursor to deposit gold films onto silica glass. These nanoparticle films showed the characteristic plasmon absorption of Au nanoparticles at 537 nm, and scanning electron microscopic (SEM) imaging confirmed the presence of individual gold particles. Nanocomposite films were deposited from the colloid concurrently with conventional CVD precursors. A film of gold particles in a host tungsten oxide matrix resulted from co-deposition with [W(OPh)(6)], while gold particles in a host titania matrix resulted from co-deposition with [Ti(O(i)Pr)(4)]. The density of Au nanoparticles within the film could be varied by changing the Au colloid concentration in the original precursor solution. Titania/gold composite films were intensely colored and showed dichromism: blue in transmitted light and red in reflected light. They showed metal-like reflection spectra and plasmon absorption. X-ray photoelectron spectroscopy and energy-dispersive X-ray analysis confirmed the presence of metallic gold, and SEM imaging showed individual Au nanoparticles embedded in the films. X-ray diffraction detected crystalline gold in the composite films. This CVD technique can be readily extended to produce other nanocomposite films by varying the colloids and precursors used, and it offers a rapid, convenient route to nanoparticle and nanocomposite thin films. PMID:16448130

  15. Thermochromic properties of Sn, W co-doped VO2 nanostructured thin film deposited by pulsed laser deposition.

    Science.gov (United States)

    Hur, M G; Masaki, T; Yoon, D H

    2014-12-01

    Tin (Sn) and tungsten (W) co-doped vanadium dioxide (VO2) nanostructured thin films with 50-nm thickness were deposited by pulsed laser deposition (PLD) to reduce the transition temperature and improve the IR transmittance. The crystal structure of the nanostructured thin films and the presence of elements were evaluated by XRD and XPS analysis. The transition temperature (T(c)) of 1 at% Sn-1 at% W co-doped VO2 nanostructured thin film was decreased to about 22 degrees C (from 70.3 to 48.5 degrees C) compared with the undoped VO2 nanostructured thin film. The transmittance width in the IR range of the co-doped nanostructured thin film decreased from 37.5% to 27% compared with the undoped VO2 nanostructured thin film. Also, the width of hysteresis was narrowed by Sn doping. PMID:25970986

  16. Deposition and characterization of Pt nanocluster films by means of gas aggregation cluster source

    Energy Technology Data Exchange (ETDEWEB)

    Kylián, Ondřej, E-mail: ondrej.kylian@gmail.com; Prokeš, Jan; Polonskyi, Oleksandr; Čechvala, Juraj; Kousal, Jaroslav; Pešička, Josef; Hanuš, Jan; Biederman, Hynek

    2014-11-28

    In this study we report on the deposition of Pt nanocluster films prepared by gas aggregation source that was operated with argon as working gas. The aim of this study was optimization of deposition process as well as determination of properties of deposited nanocluster films and their temporal stability. It was found that the production of Pt nanoclusters reached maximum value for pressure of 100 Pa and increases monotonously with magnetron current. The deposition rate at optimized deposition conditions was 0.7 nm of the Pt nanocluster film per second. Deposited films were porous and composed of 4 nm Pt nanoclusters. The nanoclusters were metallic and no sights of their oxidation were observed after 1 year on open air as witnessed by X-ray photoelectron spectroscopy. Regarding the electrical properties, a dramatic decrease of the resistivity was observed with increasing amount of deposited nanoclusters. This decrease saturated for the films approximately 50 nm thick. Such behavior indicates transition between different mechanisms of electrical conductivity: charge hopping for thin discontinuous films and current conduction through conducting path formed when higher amount of nanoclusters is deposited. Different mechanisms of electrical conduction for thin and thick layers of Pt were confirmed by subsequent investigation of temperature dependence of resistivity. In addition, no changes in resistivity were observed after one year on open air that confirms stability of produced Pt nanocluster films. - Highlights: • Pt nanocluster films were deposited by gas aggregation nanocluster source. • Conditions leading to effective deposition of Pt nanocluster films were found. • Deposited nanocluster films have good temporal stability. • Electrical properties of Pt films were found to depend on their thickness.

  17. Influences of deposition parameters on microstructure and dielectric properties of BST thin film deposited by R.F. magnetron sputtering

    International Nuclear Information System (INIS)

    Down graded barium strontium tianate(BST) thin films were prepared on Pt/Ti/SiO2/Si(100) substrate by radio frequency magnetron sputtering. The BST thin films were deposited at various substrate temperatures, then annealed at 700 deg. C for an hour. The influences of the deposition parameters on the crystallization behavior, microstructure and dielectric properties of BST thin films were investigated by X-ray diffraction, field emission scanning electron microscopy and dielectric frequency spectra. XRD results indicate that the BST thin films deposited at higher temperature have improved crystallization structure.The SEM observations show that the surface of the films is smooth with homogeneous grains.The dielectric properties of the films have been examined and discussed. The experiments show that BST thin films deposited at 650oc, 3.0Pa working pressure exhibits superior dielectric properties: the highest dielectric constant is 448 and lowest dielectric loss is 0.013 at 100 kHz, respectively. These results make BST thin films be a promising candidate for microelectronic device application.

  18. Metal-doped diamond-like carbon films synthesized by filter-arc deposition

    International Nuclear Information System (INIS)

    Diamond-like carbon (DLC) thin films are extensively utilized in the semiconductor, electric and cutting machine industries owing to their high hardness, high elastic modulus, low friction coefficients and high chemical stability. DLC films are prepared by ion beam-assisted deposition (BAD), sputter deposition, plasma-enhanced chemical vapor deposition (PECVD), cathodic arc evaporation (CAE), and filter arc deposition (FAD). The major drawbacks of these methods are the degraded hardness associated with the low sp3/sp2 bonding ratio, the rough surface and poor adhesion caused by the presence of particles. In this study, a self-developed filter arc deposition (FAD) system was employed to prepare metal-containing DLC films with a low particle density. The relationships between the DLC film properties, such as film structure, surface morphology and mechanical behavior, with variation of substrate bias and target current, are examined. Experimental results demonstrate that FAD-DLC films have a lower ratio, suggesting that FAD-DLC films have a greater sp3 bonding than the CAE-DLC films. FAD-DLC films also exhibit a low friction coefficient of 0.14 and half of the number of surface particles as in the CAE-DLC films. Introducing a CrN interfacial layer between the substrate and the DLC films enables the magnetic field strength of the filter to be controlled to improve the adhesion and effectively eliminate the contaminating particles. Accordingly, the FAD system improves the tribological properties of the DLC films

  19. Plasma-enhanced chemical vapor deposition for YBCO film fabrication of superconducting fault-current limiter

    Energy Technology Data Exchange (ETDEWEB)

    Jun, Byung Hyuk; Kim, Chan Joong

    2006-05-15

    Since the high-temperature superconductor of oxide type was founded, many researches and efforts have been performed for finding its application field. The YBCO superconducting film fabricated on economic metal substrate with uniform critical current density is considered as superconducting fault-current limiter (SFCL). There are physical and chemical processes to fabricate superconductor film, and it is understood that the chemical methods are more economic to deposit large area. Among them, chemical vapor deposition (CVD) is a promising deposition method in obtaining film uniformity. To solve the problems due to the high deposition temperature of thermal CVD, plasma-enhanced chemical vapor deposition (PECVD) is suggested. This report describes the principle and fabrication trend of SFCL, example of YBCO film deposition by PECVD method, and principle of plasma deposition.

  20. Deposition and doping of CdS/CdTe thin film solar cells

    International Nuclear Information System (INIS)

    1% oxygen is incorporated into both CdS and CdTe layers through RF sputtering of CdS/CdTe thin film solar cells. The optical and electrical parameters of the oxygenated and O2-free devices are compared after CdCl2 treatment and annealing in ambient Ar and/or air. The effects of ambient annealing on the electrical and optical properties of the films are investigated using current—voltage characterization, field emission scanning electron microscopy, X-ray diffraction, and optical transmission spectroscopy. The 1% oxygen content can slightly increase the grain size while the crystallinity does not change. Annealing in ambient Ar can increase the transmission rate of the oxygenated devices. (paper)