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Sample records for cds films grown

  1. The investigation of spray pyrolysis grown CdS thin films doped with flourine atoms

    Energy Technology Data Exchange (ETDEWEB)

    Yılmaz, Salih, E-mail: slh_yilmaz@yahoo.com.tr

    2015-12-01

    Highlights: • Undoped and F-doped CdS thin films were produced. • XRD data showed deterioration with the increase of F-doping. • SEM images indicated a grain growth after F-doping. • RTPL data exhibited an enhancement in the spectrum for F-doped CdS samples. • The best electrical and optical properties were obtained for 2 at.% F-doped CdS. - Abstract: Undoped and F-doped CdS thin films were succesfully grown on the glass substrates by the spray prolysis method. X-ray diffraction results showed that all the samples had hexagonal wurtzite structure with the (1 0 1) preferred orientation. It was found from scanning electron microscopy that an increase in the grain size was observed after F-doping. The band gap value of CdS thin films increased from 2.38 eV to 2.42 eV with the increase of F concentration from 0 to 6 at.%. The intensity of room temperature photoluminescence spectrum of undoped CdS thin films enhanced with the increment of F-doping amount that is related to the increase of point defects formed by the flourine atoms. Electrical measurements showed that the carrier concentration increased from 1.93 × 10{sup 12} cm{sup −3} to 7.62 × 10{sup 12} cm{sup −3} when CdS thin films were doped with 2 at.% F. However, further increase in F amount up to 6 at.% caused a decrease in the carrier concentration. On the other hand, resistivity value first decreased from 1.26 × 10{sup 5} Ω cm to 8.54 × 10{sup 4} Ω cm with the increase of F-doping up to 2 at.% and then increased to 1.65 × 10{sup 5} Ω cm for 6 at.% F-doping. It can be concluded that 2 at.% F-doped CdS thin films exhibited the best electrical and optical properties, which is suitable for the application of thin film solar cells.

  2. Structural and Optical Properties of CdS Thin Film Grown by Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    S. Rajpal

    2013-07-01

    Full Text Available In this work we report synthesis and optical characterization of CdS thin films coated on glass substrate. The films were deposited using chemical bath deposition method. Scanning Electron microscopy shows a uniform film of CdS film at particular concentration and dipping time. The Energy Dispersive spectroscopy reveals the presence of Cd and S in the CdS film. X-Ray diffraction confirms the cubic structure of CdS deposited on glass and amorphous nature of glass. Optical and photoluminescence studies were done using UV-Visible spectroscopy and Photoluminescence spectroscopy respectively. We have determined bandgap by analyzing UV-Visible spectra results. Wettability studies were done using Optical Contact Angle, which confirms the hydrophobic nature of the CdS films.

  3. Preparation and properties of CdS thin films grown by ILGAR method

    Institute of Scientific and Technical Information of China (English)

    QIU Jijun; JIN Zhengguo; WU Weibing; LIU Xiaoxin; CHENG Zhijie

    2004-01-01

    CdS thin films were deposited by the ion layer gas reaction (ILGAR) method. Structural, chemical, topographical development as well as optical and electrical properties of as-deposited and annealed thin films were investigated by XRD,SEM, XPS, AFM and UV-VIS. The results showed that the thin films are uniform, compact and good in adhesion to the substrates, and the growth of the films is 2.8 nm/cycle. The evolution of structure undergoes from the cubic structure to the hexagonal one with a preferred orientation along the (002) plane after annealing at 673 K. An amount of C, O and Cl impuriries can be reduced by increasing the drying temperature or by annealing in N2 atmosphere. It was found that the band gap of the CdS films shifts to higher wavelength after annealing or increasing film thickness. The electrical resistivity decreases with increasing annealing temperature and film thickness.

  4. Properties of CdS thin films grown by CBD as a function of thiourea concentration

    Energy Technology Data Exchange (ETDEWEB)

    Ximello-Quiebras, J.N.; Contreras-Puente, G.; Rueda-Morales, G.; Vigil, O. [Escuela Superior de Fisica y Matematicas-Instituto Politecnico Nacional, Edificio 9, U.P.A.L.M. 07738 DF (Mexico); Santana-Rodriguez, G. [Instituto de Investigaciones en Materiales, UNAM, CP 04510 (Mexico DF); Morales-Acevedo, A. [CINVESTAV-IPN, Depto. Ingenieria Electrica-SEES, Av. IPN 2508,CP 07360 Mexico, DF (Mexico)

    2006-04-14

    This paper reports a study of the growth rate and optical properties of CdS thin films prepared by the chemical bath deposition technique. For the deposition an aqueous solution of cadmium chloride, ammonium chloride, ammonium hydroxide and thiourea were used, the films were deposited on conducting glass (SnO{sub 2}: F). The growth kinetics is relatively fast when the quantity of thiourea is increased in the deposition solution and higher value of band gap is obtained (E{sub g}=2.44eV). The films show good transmittance in the visible region. (author)

  5. Temperature-dependent photoluminescence and mechanism of CdS thin film grown on Si nanoporous pillar array

    Energy Technology Data Exchange (ETDEWEB)

    Yan, Ling Ling [Department of Physics and Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052 (China); College of Physics and Chemistry, Henan Polytechnic University, Jiaozuo 454000 (China); Li, Yan Tao [Department of Physics and Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052 (China); School of Material Science and Engineering, Henan University of Technology, Zhengzhou 454052 (China); Hu, Chu Xiong [Department of Physics and Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052 (China); Li, Xin Jian, E-mail: lixj@zzu.edu.cn [Department of Physics and Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052 (China)

    2015-09-15

    Highlights: • CdS/silicon nanoporous pillar array (CdS/Si-NPA) was prepared by a CBD method. • The PL spectrum of CdS/Si-NPA was measured at different temperatures, from 10 to 300 K. • The PL spectrum was composed of four emission bands, obeying different mechanisms. • The PL degradation with temperature was due to phonon-induced escape of carriers. - Abstract: Si-based cadmium sulfide (CdS) is a prospective semiconductor system in constructing optoelectronic nanodevices, and this makes the study on the factors which may affect its optical and electrical properties be of special importance. Here we report that CdS thin film was grown on Si nanoporous pillar array (Si-NPA) by a chemical bath deposition method, and the luminescent properties of CdS/Si-NPA as well as its mechanism were studied by measuring and analyzing its temperature-dependent photoluminescence (PL) spectrum. The low-temperature measurement disclosed that the PL spectrum of CdS/Si-NPA could be decomposed into four emission bands, a blue band, a green band, a red band and an infrared band. The blue band was due to the luminescence from Si-NPA substrate, and the others originate from the CdS thin film. With temperature increasing, the peak energy, PL intensity and peak profile shape for the PL bands from CdS evolves differently. Through theoretical and fitting analyses, the origins of the green, red and infrared band are attributed to the near band-edge emission, the radiative recombination from surface defects to Cd vacancies and those to S interstitials, respectively. The cause of PL degradation is due to the thermal quenching process, a phonon-induced electron escape but with different activation energies. These results might provide useful information for optimizing the preparing parameters to promote the performance of Si-based CdS optoelectronic devices.

  6. Effect of low concentration Sn doping on optical properties of CdS films grown by CBD technique.

    Science.gov (United States)

    Jafari, Atefeh; Zakaria, Azmi; Rizwan, Zahid; Mohd Ghazali, Mohd Sabri

    2011-01-01

    Thin and transparent films of doped cadmium sulfide (CdS) were obtained on commercial glass substrates by Chemical Bath Deposition (CBD) technique. The films were doped with low concentration of Sn, and annealed in air at 300 °C for 45 min. The morphological characterization of the films with different amounts of dopant was made using SEM and EDAX analysis. Optical properties of the films were evaluated by measuring transmittance using the UV-vis spectrophotometer. A comparison of the results revealed that lower concentration of Sn doping improves transmittance of CdS films and makes them suitable for application as window layer of CdTe/CIGS solar cells.

  7. Photoluminescence study of polycrystalline photovoltaic CdS thin film layers grown by close-spaced sublimation and chemical bath deposition.

    OpenAIRE

    Abken, Anke E.; Halliday, D.P.; Durose, Ken

    2009-01-01

    Photoluminescence (PL) measurements were used to study the effect of postdeposition treatments by annealing and CdCl2 activation on polycrystalline CdS layer grown by close-spaced sublimation (CSS) and chemical bath deposition (CBD). CdS films were either annealed in a temperature range of 200–600 °C or CdCl2 treated between 300–550 °C. The development of “red,” “intermediate orange,” “yellow,” and “green” luminescence bands is discussed in comparison with PL assignments found in literature. ...

  8. Effect of Low Concentration Sn Doping on Optical Properties of CdS Films Grown by CBD Technique

    Directory of Open Access Journals (Sweden)

    Mohd Sabri Mohd Ghazali

    2011-09-01

    Full Text Available Thin and transparent films of doped cadmium sulfide (CdS were obtained on commercial glass substrates by Chemical Bath Deposition (CBD technique. The films were doped with low concentration of Sn, and annealed in air at 300 °C for 45 min. The morphological characterization of the films with different amounts of dopant was made using SEM and EDAX analysis. Optical properties of the films were evaluated by measuring transmittance using the UV-vis spectrophotometer. A comparison of the results revealed that lower concentration of Sn doping improves transmittance of CdS films and makes them suitable for application as window layer of CdTe/CIGS solar cells.

  9. Photoluminescence study of polycrystalline photovoltaic CdS thin film layers grown by close-spaced sublimation and chemical bath deposition

    Science.gov (United States)

    Abken, Anke E.; Halliday, D. P.; Durose, Ken

    2009-03-01

    Photoluminescence (PL) measurements were used to study the effect of postdeposition treatments by annealing and CdCl2 activation on polycrystalline CdS layer grown by close-spaced sublimation (CSS) and chemical bath deposition (CBD). CdS films were either annealed in a temperature range of 200-600 °C or CdCl2 treated between 300-550 °C. The development of "red," "intermediate orange," "yellow," and "green" luminescence bands is discussed in comparison with PL assignments found in literature. PL spectra from CdS layer grown by CSS are dominated by the yellow band with transitions at 2.08 and 1.96 eV involving (Cdi-A), (VS-A) complex states where A represents an acceptor. Green luminescence bands are observed at 2.429 and 2.393 eV at higher annealing temperature of 500-600 °C or CdCl2 treatment above 450 °C, and these peaks are associated with zero and a longitudinal optical phonon replica of "free-to-bound" transitions. As grown CBD-CdS films show a prominent red band with four main peaks located at 1.43, 1.54, 1.65, and 1.77 eV, believed to be phonon replicas coupled with local vibrational modes. This remains following postdeposition treatment. The red luminescence is associated with VS surface states and in the case of CdCl2 treatment with (VCd-ClS) centers. Postdeposition treatments of CBD and CdS promote the evolution of an intermediate orange band at 2.00 eV, most likely a donor-acceptor pair, and a yellow band at 2.12 eV correlated with (Cdi-VCd) centers. The green luminescence bands observed at 2.25 and 2.34 eV are associated with transitions from deep donor states (e.g., Cdi) to the valence band. These states form due to crystallinity enhancement and lattice conversion during annealing or CdCl2 activation. Observed changes in PL bands provide detailed information about changes in radiative recombination centers in CdS layer, which are suggested to occur during device processing of CdTe/CdS thin film solar cells.

  10. Cd xZn 1- xS solid solution thin films, CdS thin films and CdS/ZnS multilayer thin films grown by SILAR technique

    Science.gov (United States)

    Valkonen, Mika P.; Lindroos, Seppo; Leskelä, Markku

    1998-09-01

    Cd xZn 1- xS solid solution thin films were grown by successive ionic layer adsorption and reaction (SILAR) technique on soda lime glass, ITO-covered glass and polymer substrates. In addition, CdS thin films and CdS/ZnS multilayer thin films were deposited on polymer substrates. The thin films were characterized by X-ray diffraction and energy dispersive X-ray analysis. The Cd xZn 1- xS films were polycrystalline and cubic (111) or hexagonal (002) oriented. The cation/anion ratios were 1 : 1. In XRD, the CdS/ZnS multilayer samples showed not only reflections of CdS, ZnS, but also Cd xZn 1- xS formed in the interface. The Cd xZn 1- xS thin films and CdS/ZnS multilayer thin films could be tailored to a set of various composition and structure.

  11. Spectroscopic Analysis of Impurity Precipitates in CdS Films

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    Webb, J. D.; Keane, J.; Ribelin, R.; Gedvilas, L.; Swartzlander, A.; Ramanathan, K.; Albin, D. S.; Noufi, R.

    1999-10-31

    Impurities in cadmium sulfide (CdS) films are a concern in the fabrication of copper (indium, gallium) diselenide (CIGS) and cadmium telluride (CdTe) photovoltaic devices. Devices incorporating chemical-bath-deposited (CBD) CdS are comparable in quality to devices incorporating purer CdS films grown using vacuum deposition techniques, despite the higher impurity concentrations typically observed in the CBD CdS films. In this paper, we summarize and review the results of Fourier transform infrared (FTIR), Auger, electron microprobe, and X-ray photoelectron spectroscopic (XPS) analyses of the impurities in CBD CdS films. We show that these impurities differ as a function of substrate type and film deposition conditions. We also show that some of these impurities exist as 10{sup 2} micron-scale precipitates.

  12. Structural, optical and electrical properties of CdS, Cd 0.5In 0.5S and In 2S 3 thin films grown by SILAR method

    Science.gov (United States)

    Kundakci, M.; Ateş, A.; Astam, A.; Yildirim, M.

    2008-01-01

    CdS, Cd 0.5In 0.5S and In 2S 3 thin films were grown by successive ionic layer adsorption and reaction (SILAR) method on a glass substrate at room temperature. These films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Optical and electrical properties of these films have been investigated as a function of temperature. The absorption measurements were carried out in the temperature range 10-320 K with a step of 10 K. The band gap energies ‘ Eg’ for CdS, Cd 0.5In 0.5S and In 2S 3 thin films have been found as 2.38, 2.52 and 2.63 eV at 10 K, respectively. The electrical resistivity of CdS, Cd 0.5In 0.5S and In 2S 3 thin films have been determined using a ‘dc’ two-probe method, in the temperature range of 300-450 K. The electrical resistivity values have been calculated at 300 K, as 2×10 6 Ω cm, 3.5×10 7 Ω cm and 1.5×10 7 Ω cm for CdS, Cd 0.5In 0.5S and In 2S 3, respectively. This is one of the first studies which led to deposition of the CdInS thin films by using the SILAR method.

  13. Optical and structural properties of sputtered CdS films for thin film solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Donguk [School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong 300, Jangan-gu, Suwon 440-746 (Korea, Republic of); Park, Young [High-Speed Railroad Infrastructure System Research Team, Korea Railroad Research Institute, Uiwang 437-757 (Korea, Republic of); Kim, Minha [School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong 300, Jangan-gu, Suwon 440-746 (Korea, Republic of); Choi, Youngkwan [Water Facility Research Center, K-water, 125, 1689 Beon-gil, Yuseong-daero, Yuseong-gu, Daejeon 305-730 (Korea, Republic of); Park, Yong Seob [Department of Photoelectronics Information, Chosun College of Science and Technology, Gwangju (Korea, Republic of); Lee, Jaehyoeng, E-mail: jaehyeong@skku.edu [School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong 300, Jangan-gu, Suwon 440-746 (Korea, Republic of)

    2015-09-15

    Graphical abstract: Photo current–voltage curves (a) and the quantum efficiency (QE) (b) for the solar cell with CdS film grown at 300 °C. - Highlights: • CdS thin films were grown by a RF magnetron sputtering method. • Influence of growth temperature on the properties of CdS films was investigated. • At higher T{sub g}, the crystallinity of the films improved and the grains enlarged. • CdS/CdTe solar cells with efficiencies of 9.41% were prepared at 300 °C. - Abstract: CdS thin films were prepared by radio frequency magnetron sputtering at various temperatures. The effects of growth temperature on crystallinity, surface morphology and optical properties of the films were characterized with X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), Raman spectra, UV–visible spectrophotometry, and photoluminescence (PL) spectra. As the growth temperature was increased, the crystallinity of the sputtered CdS films was improved and the grains were enlarged. The characteristics of CdS/CdTe thin film solar cell appeared to be significantly influenced by the growth temperature of the CdS films. Thin film CdS/CdTe solar cells with efficiencies of 9.41% were prepared at a growth temperature of 300 °C.

  14. Growth and characterization of CdS thin films on polymer substrates for photovoltaic applications.

    Science.gov (United States)

    Park, Yongseob; Kim, Eung Kwon; Lee, Suho; Lee, Jaehyeong

    2014-05-01

    In this work, cadmium sulfide (CdS) films were deposited on flexible polymer substrates such as polycarbonate (PC) and polyethylene terephthalate (PET). The r.f. magnetron sputtering, which is cost-effective scalable technique, was used for the film deposition. The structural and optical properties of the films grown at different sputtering pressures were investigated. When the CdS film was deposited at lower pressure, the crystallinity and the preferred orientation toward c-axis in hexagonal phase was improved. However, the optical transmittance was reduced as the sputtering pressure was decreased. Compared with the glass substrate, CdS films grown on polymer substrates were exhibited some wore structural and optical characteristics. CdTe thin film solar cell applied to sputtered CdS as a window layer showed a maximum efficiency of 11.6%.

  15. Microstructural, optical and photocatalytic properties of CdS doped TiO2 thin films

    Science.gov (United States)

    Mohamed, S. H.; Shaaban, E. R.

    2011-11-01

    CdS doped TiO2 thin films (with CdS content=0, 3, 6, 9 and 12 at%) were grown on glass substrates. The X-ray diffraction analysis revealed that the films are polycrystalline of monoclinic TiO2 structure. The microstructure parameters of the films such as crystallite size (Dν) and microstrain (e) are calculated. Both the crystallites size and the microstrain are decreased with increasing CdS content. The optical constants have been determined in terms of Murmann's exact equations. The refractive index and extinction coefficient are increased with increasing CdS content. The optical band gap is calculated in the strong absorption region. The possible optical transition in these films is found to be an allowed direct transition. The values of Egopt are found to decrease as the CdS content increased. The films with 3 at% CdS content have better decomposition efficiency than undoped TiO2. The films with 6 at% and 9 at% CdS content have decomposition efficiency comparable to that of undoped TiO2, although they have lower band gap. The CdS doped TiO2 could have a better impact on the decomposing of organic wastes.

  16. Structural and Optical Study of Chemical Bath Deposited Nano-Structured CdS Thin Films

    Science.gov (United States)

    Kumar, Suresh; Sharma, Dheeraj; Sharma, Pankaj; Sharma, Vineet; Barman, P. B.; Katyal, S. C.

    2011-12-01

    CdS is commonly used as window layer in polycrystalline solar cells. The paper presents a structural and optical study of CdS nano-structured thin films. High quality CdS thin films are grown on commercial glass by means of chemical bath deposition. It involves an alkaline solution of cadmium salt, a complexant, a chalcogen source and a non-ionic surfactant. The films have been prepared under various process parameters. The chemically deposited films are annealed to estimate its effect on the structural and optical properties of films. These films (as -deposited and annealed) have been characterized by means of XRD, SEM and UV-Visible spectrophotometer. XRD of films show the nano-crystalline nature. The energy gap of films is found to be of direct in nature.

  17. Electronic and optical properties of CdS films deposited by evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Huang, L.; Wei, Z.L.; Zhang, F.M.; Wu, X.S., E-mail: xswu@nju.edu.cn

    2015-11-05

    CdS films grown by thermal evaporation on glass substrate under ultra-high vacuum are prepared with varying the growth temperature and atmosphere environment. The minimum resistivity of the films is as low as 2.0 Ω·cm, and the carrier density even reaches 1.6 × 10{sup 18} cm{sup −3}, which is much less than that prepared by the chemical bath deposition (CBD) method. The transmittance and band gap increase with the set the argon atmosphere and the growth temperature in the optimum value. Our results indicate the CdS films grown by evaporation at high vacuum may be more suitable for the application in optoelectronic devices, such as the solar cell materials. - Highlights: • CdS films are grown by the ultra-high vacuum evaporation. • CdS film here with the high carrier density reaches to 10{sup 18} cm{sup −3} is obtained. • The film has low resistivity, which is as low as 2 Ω∙ cm. • The optical band gap become wider from 2.42 eV to 2.54 eV.

  18. Optical and structural properties of chemically deposited CdS thin films on polyethylene naphthalate substrates

    Energy Technology Data Exchange (ETDEWEB)

    Sandoval-Paz, M.G., E-mail: myrnasandoval@udec.cl [Departamento de Fisica, Facultad de Ciencias Fisicas y Matematicas, Universidad de Concepcion, Casilla 160-C, Concepcion (Chile); Ramirez-Bon, R. [Centro de Investigacion y Estudios Avanzados del IPN, Unidad Queretaro, Apdo. Postal 1-798, 76001 Queretaro, Qro. (Mexico)

    2011-11-30

    CdS thin films were deposited on polyethylene naphthalate substrates by means of the chemical bath deposition technique in an ammonia-free cadmium-sodium citrate system. Three sets of CdS films were grown in precursor solutions with different contents of Cd and thiourea maintaining constant the concentration ratios [Cd]/[thiourea] and [Cd]/[sodium citrate] at 0.2 and 0.1 M/M, respectively. The concentrations of cadmium in the reaction solutions were 0.01, 7.5 Multiplication-Sign 10{sup -3} and 6.8 Multiplication-Sign 10{sup -3} M, respectively. The three sets of CdS films were homogeneous, hard, specularly reflecting, yellowish and adhered very well to the plastic substrates, quite similar to those deposited on glass substrates. The structural and optical properties of the CdS films were determined from X-ray diffraction, optical transmission and reflection spectroscopy and atomic force microscopy measurements. We found that the properties of the films depend on both the amount of Cd in the growth solutions and on the deposition time. The increasing of Cd concentration in the reaction solution yield to thicker CdS films with smaller grain size, shorter lattice constant, and higher energy band gap. The energy band gap of the CdS films varied in the range 2.42-2.54 eV depending on the precursor solution. The properties of the films were analyzed in terms of the growth mechanisms during the chemical deposition of CdS layers.

  19. Thermal and structural properties of spray pyrolysed CdS thin film

    Indian Academy of Sciences (India)

    P Raji; C Sanjeeviraja; K Ramachandran

    2005-06-01

    Using photo acoustic technique, the thermal properties of CdS thin films grown by spray pyrolysis are measured. Thermal diffusivity and conductivity in these films decrease at least two orders compared with bulk. These results are compared with our study on nano CdS and the other available literature. The comparison is good. The dependence of thermal diffusivity on the thickness of the layer or the size of the particles on the glass substrate are analysed from the present measurement and discussed. The dependence of thermal diffusivity on the thickness of the layer on the glass substrate is discussed.

  20. Analysis of chemically deposited CdSe and CdS thin films

    CERN Document Server

    Osuji, R U

    2002-01-01

    We have successfully deposited quality polycrystalline thin films of CdSe and CdS on Corning 7059 glass slides by the electroless chemical bath technique at room temperature (~27 $^\\circ$C). X-ray analysis confirmed the successful deposition of CdSe and CdS thin films. Our grown CdSe film thickness ranged from 0.10 $\\mu$m. to 0.80 $\\pm$ 0.01 $\\mu$m and the CdS film thickness ranged from 0.10 $\\mu$m to 1.00 $\\pm$ 0.01 $\\mu$m. The scanning electron micrograph of the films reveals uniform film surface. The energy gaps, $E_g$ determined for our CdSe and CdS films have average values of 1.70 $\\pm$ 0.04 eV and 2.15 $\\pm$ 0.04 eV respectively. The films have high absorbance in the 0.35 $\\mu$m - 0.85 $\\mu$m range. These qualities make them suitable for use in thin film solar cell technology.

  1. Influence of substrates on the structural and optical properties of chemically deposited CdS films

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jae-Hyeong [School of Electronic and Information Engineering, Kunsan National University, San 68, Miryong-dong, Kunsan, Jeollabuk-do, 573-701 (Korea, Republic of)]. E-mail: jhyi@kunsan.ac.kr

    2007-05-31

    Cadmium sulfide (CdS) films were chemically deposited on glass, polycarbonate (PC), polyethylene terephthalate (PET), and Si wafer. Effects of substrate types on the structural and optical properties of the films were investigated. There is a preferential orientation of the crystallites in the film grown on the glass along the c-axis (perpendicular to the plane of the substrate) producing a strong hexagonal (0 0 2) or cubic (1 1 1) peak, regardless of the presence of ITO coating. However, such preferential orientation decreases or disappears when the deposition was made onto PC or PET substrates. The crystallinity of CdS films on glass and Si is better than that of the other ones. The average transmittance of the films on PC and PET is about 50% and 55%, respectively, and increases up to 70% for glass substrate. The improvement of the transmittance was obtained from ITO-coated substrates.

  2. Hot electron induced NIR detection in CdS films.

    Science.gov (United States)

    Sharma, Alka; Kumar, Rahul; Bhattacharyya, Biplab; Husale, Sudhir

    2016-03-11

    We report the use of random Au nanoislands to enhance the absorption of CdS photodetectors at wavelengths beyond its intrinsic absorption properties from visible to NIR spectrum enabling a high performance visible-NIR photodetector. The temperature dependent annealing method was employed to form random sized Au nanoparticles on CdS films. The hot electron induced NIR photo-detection shows high responsivity of ~780 mA/W for an area of ~57 μm(2). The simulated optical response (absorption and responsivity) of Au nanoislands integrated in CdS films confirms the strong dependence of NIR sensitivity on the size and shape of Au nanoislands. The demonstration of plasmon enhanced IR sensitivity along with the cost-effective device fabrication method using CdS film enables the possibility of economical light harvesting applications which can be implemented in future technological applications.

  3. Chemical bath deposition of CdS thin films doped with Zn and Cu

    Indian Academy of Sciences (India)

    A I Oliva; J E Corona; R Patiño; A I Oliva-Avilés

    2014-04-01

    Zn- and Cu-doped CdS thin films were deposited onto glass substrates by the chemical bath technique. ZnCl2 and CuCl2 were incorporated as dopant agents into the conventional CdS chemical bath in order to promote the CdS doping process. The effect of the deposition time and the doping concentration on the physical properties of CdS films were investigated. The morphology, thickness, bandgap energy, crystalline structure and elemental composition of Zn- and Cu-doped CdS films were investigated and compared to the undoped CdS films properties. Both Zn- and Cu-doped CdS films presented a cubic crystalline structure with (1 1 1) as the preferential orientation. Lower values of the bandgap energy were observed for the doped CdS films as compared to those of the undoped CdS films. Zn-doped CdS films presented higher thickness and roughness values than those of Cu-doped CdS films. From the photoluminescence results, it is suggested that the inclusion of Zn and Cu into CdS crystalline structure promotes the formation of acceptor levels above the CdS valence band, resulting in lower bandgap energy values for the doped CdS films.

  4. CdS films deposited by chemical bath under rotation

    Energy Technology Data Exchange (ETDEWEB)

    Oliva-Aviles, A.I., E-mail: aoliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico); Patino, R.; Oliva, A.I. [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico)

    2010-08-01

    Cadmium sulfide (CdS) films were deposited on rotating substrates by the chemical bath technique. The effects of the rotation speed on the morphological, optical, and structural properties of the films were discussed. A rotating substrate-holder was fabricated such that substrates can be taken out from the bath during the deposition. CdS films were deposited at different deposition times (10, 20, 30, 40 and 50 min) onto Corning glass substrates at different rotation velocities (150, 300, 450, and 600 rpm) during chemical deposition. The chemical bath was composed by CdCl{sub 2}, KOH, NH{sub 4}NO{sub 3} and CS(NH{sub 2}){sub 2} as chemical reagents and heated at 75 deg. C. The results show no critical effects on the band gap energy and the surface roughness of the CdS films when the rotation speed changes. However, a linear increase on the deposition rate with the rotation energy was observed, meanwhile the stoichiometry was strongly affected by the rotation speed, resulting a better 1:1 Cd/S ratio as speed increases. Rotation effects may be of interest in industrial production of CdTe/CdS solar cells.

  5. Surface and interface of epitaxial CdTe film on CdS buffered van der Waals mica substrate

    Science.gov (United States)

    Yang, Y.-B.; Seewald, L.; Mohanty, Dibyajyoti; Wang, Y.; Zhang, L. H.; Kisslinger, K.; Xie, Weiyu; Shi, J.; Bhat, I.; Zhang, Shengbai; Lu, T.-M.; Wang, G.-C.

    2017-08-01

    Single crystal CdTe films are desirable for optoelectronic device applications. An important strategy of creating films with high crystallinity is through epitaxial growth on a proper single crystal substrate. We report the metalorganic chemical vapor deposition of epitaxial CdTe films on the CdS/mica substrate. The epitaxial CdS film was grown on a mica surface by thermal evaporation. Due to the weak van der Waals forces, epitaxy is achieved despite the very large interface lattice mismatch between CdS and mica (∼21-55%). The surface morphology of mica, CdS and CdTe were quantified by atomic force microscopy. The near surface structures, orientations and texture of CdTe and CdS films were characterized by the unique reflection high-energy electron diffraction surface pole figure technique. The interfaces of CdTe and CdS films and mica were characterized by X-ray pole figure technique and transmission electron microscopy. The out-of-plane and in-plane epitaxy of the heteroepitaxial films stack are determined to be CdTe(111)//CdS(0001)//mica(001) and [ 1 bar2 1 bar]CdTe//[1 bar100]CdS//[010]mica, respectively. The measured photoluminescence (PL), time resolved PL, photoresponse, and Hall mobility of the CdTe/CdS/mica indicate quality films. The use of van der Waals surface to grow epitaxial CdTe/CdS films offers an alternative strategy towards infrared imaging and solar cell applications.

  6. Studies of heat treated CSS CdS films

    Science.gov (United States)

    Marinskiy, D.; Marinskaya, S.; Viswanathan, V.; Morel, D. L.; Ferekides, C. S.

    1999-03-01

    Cadmium sulfide continues to be the most successful and widely used n-type heterojunction partner in thin film CdTe solar cells. In most cases solar cell performance is enhanced if the CdS films are heat treated prior to the deposition of the CdTe. This paper discusses the effect of H2 annealing on the resistivity of CSS-CdS films and the use of a mobility activation model to explain the observed changes in resistivity. Photoluminescence measurements of CSS CdS films heat-treated in He and in CdCl2 vapor have also been carried out. In all cases the heat treatments lead to an increase in the intensity of a photoluminescence band believed to be associated with sulfur vacancies.

  7. CdS thin films growth by fast evaporation with substrate rotation

    Energy Technology Data Exchange (ETDEWEB)

    Castro-Rodriguez, R., E-mail: romano@mda.cinvestav.mx [Applied Physics Department, CINVESTAV-IPN Merida, C.P. 97310, Merida, Yucatan (Mexico); Mendez-Gamboa, J.; Perez-Quintana, I.; Medina-Ezquivel, R. [Yucatan Autonomous University, Faculty of Engineering. AP 150 Cordemex, 97310, Merida, Yucatan (Mexico)

    2011-09-01

    CdS thin films were grown by fast evaporation technique combined with substrate rotation. The source evaporation temperature was maintained at 600 deg. C and the substrate temperature at 350 deg. C with background pressure of 1.0 m Torr. The substrates were corning glass 2947 with dimension of 1 in. x 1 in. rotate at 500 rpm during the growth. In order to verify the quality of the CdS films, the samples were analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and optical measurements. The films shown a flat uniformity thickness with growth rate of {approx}3.5 nm/s, the orientation was in the cubic-(1 1 1) and hexagonal-(0 0 2) plane in dependence of the growth time, grain size {approx}5 nm, roughness uniformity {approx}2.7 nm, transmittance in the visible region spectrum {approx}80%, energy band gap between 2.39 and 2.42 eV and short circuit photocurrent density (J{sub SC}) losses in the CdS films of 4.7 mA/cm{sup 2}.

  8. Growth of ZnS, CdS and multilayer ZnS/CdS thin films by SILAR technique

    Science.gov (United States)

    Valkonen, Mika P.; Kanniainen, Tapio; Lindroos, Seppo; Leskelä, Markku; Rauhala, Eero

    1997-08-01

    Successive ionic layer adsorption and reaction (SILAR) technique was used to deposit cadmium sulfide (CdS) and zinc sulfide (ZnS) thin films on (100)GaAs. CdS thin films were also grown on ITO-covered glass substrates. Multilayer CdS/ZnS thin films were deposited on glass substrates. The crystallinity of the thin films was characterized by means of X-ray diffraction and they all turned out to be polycrystalline. The thin films looked relatively smooth and homogeneous in scanning electron microscopy (SEM) images. Energy dispersive X-ray analysis (EDX) and Rutherford backscattering spectroscopy (RBS) proved nearly 1 : 1 stoichiometry for the multilayer samples. Thickness of the thin films was measured by RBS and chemical analysis.

  9. Photoelectrochemical and Raman characterization of nanocrystalline CdS grown on ZnO by successive ionic layer adsorption and reaction method

    Energy Technology Data Exchange (ETDEWEB)

    Kozytskiy, A.V. [L.V. Pysarzhevsky Institute of Physical Chemistry of National Academy of Sciences of Ukraine, 31 Nauky Av., 03028 Kyiv (Ukraine); Stroyuk, O.L., E-mail: stroyuk@inphyschem-nas.kiev.ua [L.V. Pysarzhevsky Institute of Physical Chemistry of National Academy of Sciences of Ukraine, 31 Nauky Av., 03028 Kyiv (Ukraine); Kuchmiy, S.Ya. [L.V. Pysarzhevsky Institute of Physical Chemistry of National Academy of Sciences of Ukraine, 31 Nauky Av., 03028 Kyiv (Ukraine); Mazanik, A.V.; Poznyak, S.K. [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Streltsov, E.A., E-mail: streltea@bsu.by [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Kulak, A.I., E-mail: kulak@igic.bas-net.by [Institute of General and Inorganic Chemistry, National Academy of Sciences of Belarus, Surganova str., 9/1, Minsk 220072 (Belarus); Korolik, O.V. [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Dzhagan, V.M., E-mail: dzhagan@isp.kiev.ua [V.E. Lashkaryov Institute of Semiconductor Physics of National Academy of Sciences of Ukraine, 41 Nauky Av., 03028 Kyiv (Ukraine)

    2014-07-01

    Properties of CdS nanoparticles (NPs) grown by successive ionic layer adsorption and reaction (SILAR) method on the surface of electrodeposited ZnO films were studied by Raman, photocurrent and UV–Vis absorption spectroscopies. The CdS nanoparticles deposited at a SILAR cycle number (N) from 5 to 10 exhibit a broadening of the band gap (E{sub g}) by 0.17–0.31 eV as compared with that of the CdS particles grown at N = 30. The size quantization of the interband transition energy in CdS nanoparticles is in accordance with the Raman spectroscopic data demonstrating a considerable increase in the LO peak intensity with increasing the N from 5 to 10 as a result of transition to resonant light scattering. The spectral width of the LO peak decreases from 50 to 15 cm{sup −1} as the N increases from 5 to 30 reflecting a less pronounced effect of the nanoparticle surface on the phonon scattering. A large spectral width of the Raman peaks is assumed to originate from a complex structure of the CdS nanoparticles comprising crystallinity domains that can affect the phonon confinement. The photocurrent spectroscopy of ZnO/CdS heterostructures showed that the band gap of CdS NPs deposited at N > 20 is smaller by ∼ 0.08 eV than that of bulk cadmium sulfide. It was concluded that this effect is not associated with photoexcitation of structural defects but rather reflects intrinsic electronic properties of SILAR-deposited CdS nanoparticles. - Highlights: • Visible-light-sensitive ZnO/CdS heterostructures were prepared by SILAR. • A large Raman peak width originates from a complex structure of CdS nanoparticles. • Vibrational properties of CdS nanoparticles depend on SILAR cycle number.

  10. Optical properties of CdS sintered film

    Indian Academy of Sciences (India)

    D Patidar; R Sharma; N Jain; T P Sharma; N S Saxena

    2006-02-01

    Chemical method has been used to prepare cadmium sulphide by using cadmium, hydrochloric acid and H2S. The reflection spectra of covered and uncovered sintered films of CdS have been recorded by ‘Hitachi spectrophotometer’ over the wavelength range 300–700 nm. The energy band gaps of these films have been calculated from reflection spectra. It is found that the energy band gap of both films is same as 2.41 eV. It is indicated that energy band gap of these films does not change. This value of band gap is in good agreement with the value reported by other workers. The measurement of photocurrent has also been carried out using Keithley High Resistance meter/ Electrometer. This film shows the high photosensitivity and high photocurrent decay. Thus so obtained films are suitable for fabrication of photo detectors and solar cells.

  11. CDS

    Science.gov (United States)

    Allen, Mark

    2015-12-01

    The Centre de Donnees de Strasbourg (CDS) is a reference data centre for Astronomy. The CDS services; SIMBAD, Vizier, Aladin and X-Match, provide added value to scientific content in order to support the astronomy research community. Data and information are curated from refereed journals, major surveys, observatories and missions with a strong emphasis on maintaining a high level of quality. The current status and plans of the CDS will be presented, highlighting how the recent innovations of the HiPS (Hierarchical Progressive surveys) and MOC (Multi-Order Coverage map) systems enable the visualisation of hundreds of surveys and data sets, and brings new levels of interoperability between catalogues, surveys images and data cubes.

  12. Effects of bacteria on CdS thin films used in technological devices

    Science.gov (United States)

    Alpdoğan, S.; Adıgüzel, A. O.; Sahan, B.; Tunçer, M.; Metin Gubur, H.

    2017-04-01

    Cadmium sulfide (CdS) thin films were fabricated on glass substrates by the chemical bath deposition method at 70 {}^\\circ \\text{C} considering deposition times ranging from 2 h to 5 h. The optical band gaps of CdS thin films were found to be in the 2.42-2.37 eV range. CdS thin films had uniform spherical nano-size grains which had polycrystalline, hexagonal and cubic phases. The films had a characteristic electrical resistivity of the order of {{10}5} Ω \\text{cm} and n-type conductivity at room condition. CdS thin films were incubated in cultures of B.domonas aeruginosa and Staphylococcus aureus, which exist abundantly in the environment, and form biofilms. SEM images showed that S. aureus and K. pneumonia were detected significantly on the film surfaces with a few of P. aeruginosa and B. subtilis cells attached. CdS thin film surface exhibits relatively good resistance to the colonization of P. aeruginosa and B. subtilis. Optical results showed that the band gap of CdS thin films which interacted with the bacteria is 2.42 \\text{eV} . The crystal structure and electrical properties of CdS thin films were not affected by bacterial adhesion. The antimicrobial effect of CdS nanoparticles was different for different bacterial strains.

  13. Annealing effects on the chemical deposited CdS films and the electrical properties of CdS/CdTe solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Han, Junfeng [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871 (China); Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany); Liao, Cheng, E-mail: Cliao@pku.edu.cn [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871 (China); Jiang, Tao [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871 (China); Fu, Ganhua; Krishnakumar, V.; Spanheimer, C.; Haindl, G. [Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany); Zhao, Kui [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871 (China); Klein, A.; Jaegermann, W. [Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany)

    2011-02-15

    Graphical abstract: From XPS core level spectras, compared with as-depositing CdS (sample A), the Fermi level is shifting closer to the conduction band after annealing treatment in the oxygen (sample B) while it is shifting closer to the valence band after annealing treatment in the argon-hydrogen (sample C). That might be the main reason of the different performance of the final devices. The open circuit voltage of the CdS/CdTe solar cell increases when the CBD CdS is annealed with oxygen, while the performance of the solar cell decreases when the CBD CdS is annealed with argon-hydrogen. Research highlights: {yields} Two different methods (oxidation and reduction) were used to anneal CdS films for CdTe solar cells. {yields} Electrical properties were analyzed by XPS (Fermi levels of CdS films). {yields} Annealing treatment in oxidation atmosphere could shift Fermi level of CdS film to higher position and consequently improve the CdS/CdTe junction and performance of solar cells. -- Abstract: CdS layers grown by chemical bath deposition (CBD) are annealed in the oxygen and argon-hydrogen atmosphere respectively. It has been found that the open circuit voltage of the CdS/CdTe solar cell increases when the CBD CdS is annealed with oxygen before the deposition of CdTe by close spaced sublimation (CSS), while the performance of the solar cell decreases when the CBD CdS is annealed with argon-hydrogen. Electronic properties of the CdS films are investigated using X-ray photo-electron spectroscopy (XPS), which indicates that the Fermi level is shifting closer to the conduction band after annealing in the oxygen and consequently a higher open circuit voltage of the solar cell can be obtained.

  14. Luminescence properties of Eu3+/CDs/PVA composite applied in light conversion film

    Science.gov (United States)

    He, Jiangling; He, Youling; Zhuang, Jianle; Zhang, Haoran; Lei, Bingfu; Liu, Yingliang

    2016-12-01

    In this work, blue-light-emitting carbon dots (CDs) were composited with red-light-emitting europium ions (Eu3+) solutions under the synergistic reaction of polyvinyl alcohol (PVA) to prepare the light conversion film. The formation mechanism of Eu3+/CDs/PVA film was detailedly discussed. It is the first report that this composite was synthesized through direct recombination of CDs and Eu3+ solutions instead of traditional methods based on Eu3+ coordination compound. Furthermore, tunable photoluminescence property can be successfully achieved by controlling the ratio of CDs to doped Eu3+, this property can meet the variable light component requirements for different species of plants.

  15. Raman spectroscopy of optical properties in CdS thin films

    Directory of Open Access Journals (Sweden)

    Trajić J.

    2015-01-01

    Full Text Available Properties of CdS thin films were investigated applying atomic force microscopy (AFM and Raman spectroscopy. CdS thin films were prepared by using thermal evaporation technique under base pressure 2 x 10-5 torr. The quality of these films was investigated by AFM spectroscopy. We apply Raman scattering to investigate optical properties of CdS thin films, and reveal existence of surface optical phonon (SOP mode at 297 cm-1. Effective permittivity of mixture were modeled by Maxwell - Garnet approximation. [Projekat Ministarstva nauke Republike Srbije, br. 45003

  16. A comparative study of CdS thin films deposited by different techniques

    Energy Technology Data Exchange (ETDEWEB)

    Pérez-Hernández, G., E-mail: german.perez@ujat.mx [Universidad Juárez Autónoma de Tabasco, Avenida Universidad s/n, Col. Magisterial, Villahermosa, Tabasco 86040 (Mexico); Pantoja-Enríquez, J. [Centro de Investigación y Desarrollo Tecnológico en Energías Renovables, UNICACH, Libramiento Norte No 1150, Tuxtla Gutiérrez, Chiapas 29039 (Mexico); Escobar-Morales, B. [Instituto Tecnológico de Cancún, Avenida Kábah Km 3, Cancún, Quintana Roo 77500 (Mexico); Martinez-Hernández, D.; Díaz-Flores, L.L.; Ricardez-Jiménez, C. [Universidad Juárez Autónoma de Tabasco, Avenida Universidad s/n, Col. Magisterial, Villahermosa, Tabasco 86040 (Mexico); Mathews, N.R.; Mathew, X. [Centro de Investigación en Energía, Universidad Nacional Autónoma de México, Temixco, Morelos 62580 (Mexico)

    2013-05-01

    Cadmium sulfide thin-films were deposited on glass slides and SnO{sub 2}:F coated glass substrates by chemical bath deposition, sputtering and close-spaced sublimation techniques. The films were studied for the structural and opto-electronic properties after annealing in an ambient identical to that employed in the fabrication of CdTe/CdS devices. Quantum efficiency of the CdTe/CdS solar cells fabricated with CdS buffer films prepared by the three methods were investigated to understand the role of CdS film preparation method on the blue response of the devices. The higher blue response observed for the devices fabricated with chemical bath deposited CdS film is discussed. - Highlights: ► CdS films were prepared by different techniques. ► Role of CdS on the blue response of device was studied. ► Structural and optical properties of CdS were analyzed. ► Chemically deposited CdS has high blue transmittance. ► CdS deposition method influences diffusion of S and Te.

  17. Influence of film thickness and In-doping on physical properties of CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Butt, Sajid, E-mail: sajidarif@hotmail.com [Department of Materials Science and Engineering, Institute of Space Technology (IST), Islamabad 44000 (Pakistan); Thermal Transport Laboratory, School of Chemical and Materials Engineering, National University of Sciences and Technology, Islamabad (Pakistan); Shah, Nazar Abbas [Department of Physics, COMSATS Institute of Information Technology, Islamabad (Pakistan); Nazir, Adnan [Istituto Italiano di Tecnologia, Via Morego 30, I-16163 Genova (Italy); Ali, Zulfiqar [Optics Laboratories, P. O. Box 1021, Islamabad (Pakistan); Maqsood, Asghri [CESET, Center for Emerging Sciences, Engineering and Technology, Islamabad (Pakistan)

    2014-02-25

    Highlights: • Fabrication of polycrystalline CdS thin films by Close Spaced Sublimation technique. • The direct band gap of 2.44 eV and the electrical resistivity in the order of 10{sup 6}–10{sup 8} Ω cm was measured. • Resistivity was reduced to the order of 10{sup –2}–10{sup 1} Ω m by the thermally diffusion of indium into CdS films. -- Abstract: Polycrystalline CdS thin films were deposited on glass substrates by close spaced sublimation technique. Samples of various thicknesses, ranging from 250 to 940 nm were obtained. The optical and electrical properties of pure CdS thin films were studied as a function of film thickness. The resistivity of as-deposited CdS films was in the order of 10{sup 6}–10{sup 8} Ω cm, depending upon the film thickness. In the high temperature region, carriers are transported over the grain boundaries by thermionic emission. Resistivity was reduced to the order of 10{sup −2}–10{sup 1} Ω cm by the thermally diffusion of indium into CdS films, without changing the type of carriers. The annealing temperature dependence of structural, optical and electrical properties of In-doped CdS films showed that the samples annealed at 350 °C and 400 °C exhibited better results.

  18. CdS thin films prepared by laser assisted chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Garcia, L.V.; Mendivil, M.I.; Garcia Guillen, G.; Aguilar Martinez, J.A. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); Krishnan, B. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); CIIDIT – Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico); Avellaneda, D.; Castillo, G.A.; Das Roy, T.K. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); Shaji, S., E-mail: sshajis@yahoo.com [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); CIIDIT – Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico)

    2015-05-01

    Highlights: • CdS thin films by conventional CBD and laser assisted CBD. • Characterized these films using XRD, XPS, AFM, optical and electrical measurements. • Accelerated growth was observed in the laser assisted CBD process. • Improved dark conductivity and good photocurrent response for the LACBD CdS. - Abstract: In this work, we report the preparation and characterization of CdS thin films by laser assisted chemical bath deposition (LACBD). CdS thin films were prepared from a chemical bath containing cadmium chloride, triethanolamine, ammonium hydroxide and thiourea under various deposition conditions. The thin films were deposited by in situ irradiation of the bath using a continuous laser of wavelength 532 nm, varying the power density. The thin films obtained during deposition of 10, 20 and 30 min were analyzed. The changes in morphology, structure, composition, optical and electrical properties of the CdS thin films due to in situ irradiation of the bath were analyzed by atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and UV–vis spectroscopy. The thin films obtained by LACBD were nanocrystalline, photoconductive and presented interesting morphologies. The results showed that LACBD is an effective synthesis technique to obtain nanocrystalline CdS thin films having good optoelectronic properties.

  19. A comparative study on CdS: PEO and CdS: PMMA nanocomposite solid films

    Energy Technology Data Exchange (ETDEWEB)

    Padmaja, S. [Thin film centre, PSG College of Technology, Coimbatore (India); Jayakumar, S., E-mail: s_jayakumar_99@yahoo.com [Department of Physics, PSG Institute of Technology and Applied Research, Coimbatore (India); Balaji, R.; Vaideki, K. [Thin film centre, PSG College of Technology, Coimbatore (India)

    2016-08-15

    Cadmium Sulphide (CdS) nanoparticles were reinforced in Poly(ethylene Oxide) (PEO) and Poly(methyl methacrylate) (PMMA) matrices by in situ technique. The presence of CdS in PEO and PMMA matrix was confirmed using X-ray photoelectron spectroscopy (XPS). Fourier Transform Infrared spectroscopy (FTIR) analysis disclosed the co-ordination of CdS in the matrices. Thermal analysis of the nanocomposites was carried out using Differential Scanning calorimetric studies (DSC). The optical studies using UV–vis spectroscopy were carried out to find the band gap of the materials and the absorption onset. The CdS particle size in the matrices was found by Effective Mass Approximation (EMA) model using the band gap values and was confirmed by TEM studies. The surface trapped emissions of the nanocomposites were observed from the photoluminescence (PL) spectra. The distribution of CdS particles in the polymer matrices were presented by Atomic force microscopic studies (AFM).

  20. Chemical surface deposition of cds thin films from CdI2 aqueous solution

    Directory of Open Access Journals (Sweden)

    G. Il’chuk

    2009-01-01

    Full Text Available For the first time using CdI2 solution CdS films on glass and ITO coated glass substrates were produced by the method of layerwise chemical surface deposition (ChSD. CdS thin films with the widths from 40 nm to 100 nm were obtained for windows in solar cells based on CdS/CdTe heterojunctions. Changes of the structural and optical properties of CdS films due to air annealing are shown.

  1. Preparation of polycrystalline CdS thin films by chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lee, E.A.; Kim, B.S.; Shin, S.H.; Park, J.I.; Park, K.J. [National Industrial Technology Inst., Kwacheon (Korea, Republic of). Div. of Inorganic Chemistry

    1996-12-31

    CdS has been recognized as a promising n-type window material for CdTe/CdS and CuInSe{sub 2}/CdS heterojunction thin film solar cells. The authors prepared CdS thin films from a solution containing cadmium acetate, thiourea, ammonia, and ammonium acetate. They varied fabrication conditions such as the concentrations of reactants, reaction temperature, and heat treatment, to investigate the changes in structural and optical properties of the film. Effects of substrate on the properties were also investigated.

  2. Structure and property of CdS thin films with different residual chlorine content

    Science.gov (United States)

    Feng, Kai; Wu, Weibing; Shan, Beibei; Nan, Huilin

    2016-10-01

    Two types of CdS thin films were synthesized via chemical bath deposition (CBD) method from solutions of acetate and chloride, respectively. The structural and photoelectric characteristics of both CdS thin films were characterized by XRD, SEM, PL, UV-vis and electrochemical measurements. The pristine films were hexagonal regardless of anion type in CBD solutions. Cl residual was confirmed in the CdS film from the Cl-containing solution. The residual Cl helps to reduce S vacancies and improve the crystallinity during annealing, which is proved by the left shift of peaks in XRD patterns, the increased band gap, and the lower carrier concentration. The present results are significant in choosing suitable anions during the CBD deposition of CdS thin film for improving the device performance of CdTe solar cell.

  3. Facile method to prepare CdS nanostructure based on the CdTe films

    Energy Technology Data Exchange (ETDEWEB)

    Ma, Ligang; Chen, Yuehui; Wei, Zelu; Cai, Hongling; Zhang, Fengming; Wu, Xiaoshan, E-mail: xswu@nju.edu.cn

    2015-09-15

    Graphical abstract: - Highlights: • CdS nanostructure is directly fabricated on CdTe film only by heating treatment under H{sub 2}S/N{sub 2} mixed atmosphere at a relatively low temperature (450 °C) with gold layer as the intermediate. • Nanostructure of CdS layer, varying from nanowires to nanosheets, may be controlled by the thickness of gold film. • The change of morphology adjusts its luminescence properties. - Abstract: Nanostructured cadmium sulfide (CdS) plays critical roles in electronics and optoelectronics. In this paper, we report a method to fabricate CdS nanostructure directly on CdTe film, via a thermal annealing method in H{sub 2}S/N{sub 2} mixed gas flow at a relatively low temperature (450 °C). The microstructure and optical properties of CdS nanostructure are investigated by X-ray diffraction, transmission electron microscopy, Raman, and photoluminescence. The morphology of CdS nanostructure, evolving from nanowires to nanosheets, can be controlled by the thickness of Au film deposited on the CdTe film. And CdS nanostructures are single crystalline with the hexagonal wurtzite structure. Raman spectroscopy under varying the excitation wavelengths confirm that synthesized CdS-CdTe films contain two layers, i.e., CdS nanostructure (top) and CdTe layer (bottom). The change of morphology modifies its luminescence properties. Obviously, through simply thermal annealing in H{sub 2}S/N{sub 2} mixed gas, fabricating CdS nanostructure on CdTe film can open up the new possibility for obtaining high efficient CdTe solar cell.

  4. Stress and morphological development of CdS and ZnS thin films during the SILAR growth on (1 0 0)GaAs

    Science.gov (United States)

    Laukaitis, Giedrius; Lindroos, Seppo; Tamulevičius, Sigitas; Leskelä, Markku

    2001-12-01

    Cadmium sulfide and zinc sulfide films were grown on (1 0 0)GaAs substrate by successive ionic layer adsorption and reaction (SILAR) technique from aqueous precursor solutions at room temperature and normal pressure. The stress development of the thin films was characterized by laser interferometry as a function of the thickness of the films. The morphology and roughness of the films were monitored by atomic force microscopy. Additionally the crystallinity and crystallite size were analyzed by X-ray diffraction and composition by electron spectroscopy for chemical analysis. The CdS thin films had significantly higher stress level and also better crystallinity compared with ZnS thin films. Both films were polycrystalline and cubic, but the CdS thin films followed the substrate (1 0 0) orientation, whereas the ZnS films were (1 1 1) orientated. The roughness vs. film thickness curves of both films followed each other in shape, but the CdS films consisted of smaller particles.

  5. Photo current generation in RGO - CdS nanorod thin film device

    Science.gov (United States)

    Chakraborty, Koushik; Chakrabarty, Sankalpita; Ibrahim, Sk.; Pal, Tanusri; Ghosh, Surajit

    2016-05-01

    Herein, we report the synthesis and characterization of reduced graphene oxide (RGO) - cadmium sulfide (CdS) nanocomposite materials. The reduction of GO, formation of CdS and decoration of CdS onto RGO sheets were done in a one- pot solvothermal process. We have observed that the PL intensity for CdS nanorods remarkably quenched after the attachment of RGO, which established the photo induced charge transformation from the CdS nanorod to RGO sheets through the RGO-CdS interface. The optoelectronic transport properties of our fabricated large area thin film device exhibits excellent photo induced charge generation under simulated solar light illumination. The photo sensitivity of the device increases linearly with the increase of illuminated light intensity. The RGO-CdS composite exhibits enhance photocatalytic dye degradation efficiency in compare to control CdS under simulated solar light illumination.

  6. Shallow bath chemical deposition of CdS thin film

    Energy Technology Data Exchange (ETDEWEB)

    Lo, Y.S. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Choubey, R.K. [Department of Applied Physics, Birla Institute of Technology, Mesra, Ranchi, 835 215 (India); Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China); Yu, W.C. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Hsu, W.T. [Green Energy and Environmental Research Laboratory, Industrial Technology Research Institute, Hsin-Chu, Taiwan (China); Lan, C.W., E-mail: cwlan@ntu.edu.tw [Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China)

    2011-10-31

    Cadmium sulfide thin film was grown by shallow chemical bath deposition technique. This technique used a highly conducted hot plate to heat the substrate, while using a shallow bath for higher thermal gradients. As a result, large area uniformity could be achieved and the homogeneous nucleation was suppressed. More importantly, the solution used was greatly reduced, which is crucial for cost reduction in practice. The effects of temperature and shaking on the growth kinetics and film properties were investigated. The reaction activation energy was obtained to be 0.84 eV, and was not affected much by shaking indicating that the deposition is essentially reaction controlled. Furthermore, the films deposited at low or high temperature conditions had better photoconductivity.

  7. Characterization of deposited CdS thin films by Spray Pyrolysis method and used in Cd/CdS/p-Si/Al structure

    Science.gov (United States)

    Özakın, Oǧuzhan; Aktaş, Şeydanur; Güzeldir, Betül; Saǧlam, Mustafa

    2017-04-01

    In our study, as p-type crystalline Si substrate was used. Omic contact was performed by evaporating Al metal on the matt surface of crystal. On the other surface of it CdS thin film were enlarged with the technique of Spray Pyrolysis. Structural characteristics of the grown thin film was examined SEM and EDAX image. When examining SEM image of CdS thin film were totally covered the p-Si crystal surface of it was nearly homogeneous and The EDAX spectra showed that the expected different ratios metal percent exist in the alloys, approximately. On the CdS films whose surface features were investigated, at 10-7 torr pressure was obtained Cd/CdS/p-Si/Al sandwich structure by evaporating Cd. Firstly, the I-V (current-voltage) characteristics on 80K between 320K at room temperature of this structure was measured. I-V characteristics of the examined at parameters diodes calculation, Thermionic Emission, were used. The characteristic parameters such as barrier height and ideality factor of this structure have been calculated from the forward bias I-V characteristics. Consequently, it was seen that CdS thin film grown on p-Si semiconductor will be used confidently in Cd/p-Si metal-semiconductor contacts thanks to Spray Pyrolysis method.

  8. Synthesis and characterization of screen-printed CdS films

    Directory of Open Access Journals (Sweden)

    Kumar V.

    2011-01-01

    Full Text Available Cadmium sulphide films having energy band gap of 2.4 eV found applications in solar cells and electroluminescent devices. CdS polycrystalline films have been prepared on ultra-clean glass substrate by screen-printing technique and then sintered in air. Optimum conditions for preparing good quality screen-printed films have been found. The optical band gaps ‘Eg’ of the CdS films were determined from the UV transmission spectroscopy and were found to be 2.47eV. The Wurtzite structure of CdS films was confirmed by X-ray diffraction analysis. DC conductivity and activation energy of films was also measured in vacuum by two-probe technique.

  9. Solution precursor plasma deposition of nanostructured CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Tummala, Raghavender [Department of Mechanical Engineering, University of Michigan, Dearborn, MI 48128 (United States); Guduru, Ramesh K., E-mail: rkguduru@umich.edu [Department of Mechanical Engineering, University of Michigan, Dearborn, MI 48128 (United States); Mohanty, Pravansu S. [Department of Mechanical Engineering, University of Michigan, Dearborn, MI 48128 (United States)

    2012-03-15

    Highlights: Black-Right-Pointing-Pointer Inexpensive process with capability to produce large scale nanostructured coatings. Black-Right-Pointing-Pointer Technique can be employed to spray the coatings on any kind of substrates including polymers. Black-Right-Pointing-Pointer The CdS coatings developed have good electrical conductivity and optical properties. Black-Right-Pointing-Pointer Coatings possess large amount of particulate boundaries and nanostructured grains. -- Abstract: Cadmium sulfide (CdS) films are used in solar cells, sensors and microelectronics. A variety of techniques, such as vapor based techniques, wet chemical methods and spray pyrolysis are frequently employed to develop adherent CdS films. In the present study, rapid deposition of CdS thin films via plasma spray route using a solution precursor was investigated, for the first time. Solution precursor comprising cadmium chloride, thiourea and distilled water was fed into a DC plasma jet via an axial atomizer to create ultrafine droplets for instantaneous and accelerated thermal decomposition in the plasma plume. The resulting molten/semi-molten ultrafine/nanoparticles of CdS eventually propel toward the substrate to form continuous CdS films. The chemistry of the solution precursor was found to be critical in plasma pyrolysis to control the stoichiometry and composition of the films. X-ray diffraction studies confirmed hexagonal {alpha}-CdS structure. Surface morphology and microstructures were investigated to compare with other synthesis techniques in terms of process mechanism and structural features. Transmission electron microscopy studies revealed nanostructures in the atomized particulates. Optical measurements indicated a decreasing transmittance in the visible light with increasing the film thickness and band gap was calculated to be {approx}2.5 eV. The electrical resistivity of the films (0.243 {+-} 0.188 Multiplication-Sign 10{sup 5} {Omega} cm) was comparable with the literature

  10. [Research on the polycrystalline CdS thin films prepared by close-spaced sublimation].

    Science.gov (United States)

    Yang, Ding-Yu; Xia, Geng-Pei; Zheng, Jia-Gui; Feng, Liang-Huan; Cai, Ya-Ping

    2009-01-01

    In the present paper, the factors of influence on the deposition rate of CdS films prepared by close-spaced sublimation (CSS) were first studied systematically, and it was found from the experiments that the deposition rate increased with the raised temperature of sublimation source, while decreased with the raised substrate temperature and the deposition pressure. The structure, morphology and light transmittance of the prepared samples were tested subsequently, and the results show: (1) The CdS films deposited under different oxygen partial pressure all present predominating growth lattice orientation (103), and further more the films will be strengthened after annealed under CdCl2 atmosphere. (2) The AFM images of CdS show that the films are compact and uniform in grain diameter, and the grain size becomes larger with the increased substrate temperature. Along with it, the film roughness was also augmented. (3) The transmittance in the shortwave region of visible light through the CdS films would be enhanced when its thickness is reduced, and that will help improve the shortwave spectral response of CdTe solar cells. Finally, the prepared CdS films were employed to fabricate CdTe solar cells, which have achieved a conversion efficiency of 10.29%, and thus the feasibility of CSS process in the manufacture of CdTe solar cells was validated primarily.

  11. Deposition Methods and Properties of Polycrystalline CdS Thin Films

    Institute of Scientific and Technical Information of China (English)

    LIANG Qian; ZENG Guanggen; LI Bing; WANG Wenwu; JIANG Haibo; ZHANG Jingquan; LI Wei; WU Lili; FENG Lianghuan

    2015-01-01

    CdS thin film was used as a suitable window layer for CdS/CdTe solar cell, and the properties of CdS thin films deposited by pulsed laser deposition (PLD), chemical bath deposition (CBD) and magnetron sputtering (MS) were reported. The experimental results show that the transmittances of PLD-CdS thin films are about 85%and the band gaps are about 2.38-2.42eV. SEM results show that the surface of PLD-CdS thin film is much more compact and uniform. PLD is more suitable to prepare the CdS thin films than CBD and MS. Based on the thorough study, by using totally PLD technique, the FTO/PLD-CdS(150 nm)/CSS-CdTe solar cell (0.0707 cm2) can be prepared with an efficiency of 10.475%.

  12. Characterization of CdS Thin-Film in High Efficient CdS/CdTe Solar Cells

    Science.gov (United States)

    Tsuji, Miwa; Aramoto, Tetsuya; Ohyama, Hideaki; Hibino, Takeshi; Omura, Kuniyoshi

    2000-07-01

    Cadmium sulfide (CdS) thin films are the most commonly used window materials for high efficient cadmium telluride (CdTe) and chalcopyrite polycrystalline thin-film photovoltaic devices. High efficient CdS/CdTe solar cells with thin CdS films have been developed using ultrathin CdS films with a thickness of less than 0.1 μm. CdS films were deposited on transparent conductive oxide (TCO)/glass substrates by the metal organic chemical vapor deposition (MOCVD) technique. CdTe films were subsequently deposited by the close-spaced sublimation (CSS) technique. The screen printing and sintering method fabricated carbon and silver electrodes. Cell performance depends primarily on the electrical and optical properties of CdS films. Therefore we started to develop higher-quality CdS films and found clear differences between high- and low-quality CdS films from the analyses of scanning electron microscope (SEM), atomic force microscope (AFM), secondary ion mass spectroscopy (SIMS), thermal desorption spectrometry (TDS) and Fourier transforms-infrared spectrometry (FT-IR) measurements. As a result of controlling the quality of CdS films, a photovoltaic conversion efficiency of 10.5% has been achieved for size of 1376 cm2 of the solar cells under the Air Mass (AM) 1.5 conditions of the Japan Quality Assurance Organization.

  13. Characterization of CdS thin film in high efficient CdS/CdTe solar cells

    Science.gov (United States)

    Tsuji, Miwa; Aramoto, Tetsuya; Ohyama, Hideaki; Hibino, Takeshi; Omura, Kuniyoshi

    2000-06-01

    Cadmium sulfide (CdS) thin film is the most commonly used window material for high-efficient cadmium telluride (CdTe) thin-film photovoltaic devices. High-efficient CdS/CdTe solar cells have been developed using ultra-thin CdS films having a thickness of below 0.1 μm. CdS film is deposited on transparent conductive oxide (TCO) film coated glass substrates by the metal organic chemical vapor deposition (MOCVD) technique, CdTe film is subsequently deposited by the close-spaced sublimation (CSS) technique. Finally, carbon and Ag-In electrodes are fabricated by the screen printing and sintering method. Cell performance depends primarily on the electrical and optical properties of CdS film, and hence we started to develop higher quality CdS film and found out clear differences between high- and low-quality CdS films from various analyses: SEM, AFM, SIMS, TDS and FT-IR. As a result of controlling qualities of CdS films, photovoltaic conversion efficiency of 10.5% has been achieved for a size of 1376 cm 2 of the solar module under air mass (AM) 1.5 conditions by the Japan Quality Assurance Organization (JQA).

  14. Photodecomposition of methylene blue by amorphous TiO2, CdS and TiO2-CdS films

    OpenAIRE

    F.G. Nieto-Caballero; E. Sánchez-Mora; J. M. Gracia-Jiménez; N.R. Silva-González; A.G. Rodríguez

    2007-01-01

    TiO2is one of the most widely studied oxide materials for applications related to photocatalytic processes. It has been reported that TiO2combined with CdS produces an improvement in the photocatalytic efficiency. This work focuses on the obtainment of TiO2, CdS and TiO2-CdSin situthin films by the sol-gel/dip coating method. After deposition on glass, each film was calcined at 300oC in an argon atmospherefor 30 min. The films were characterized by SEM, UV-Vis, XRD and micro-Raman. The TiO...

  15. The analysis of CdS thin film at the processes of manufacturing CdS/CdTe solar cells

    Science.gov (United States)

    Chun, S.; Jung, Y.; Kim, J.; Kim, D.

    2011-07-01

    In sequence, the deposited CdS thin film had undergone physical and optical changes by the processes of manufacturing CdS/CdTe solar cells. CdS thin film was manufactured by the Chemical Bath Deposition (CBD) method. The aqueous solution was based on ammonia solution. The temperature of bath system was 75 °C and deposition time was 50 min. The thickness of deposited CdS thin film was about 200 nm. The substrate was the glass coated with SnO 2:F thin film. The following process was the deposition of CdTe thin film by the Closed-Space-Sublimation (CSS) method. The final process was the CdCl 2 heat treatment at N 2+O 2 atmosphere, and the contrast experiment progressed for CdCl 2-CdS thin film after CSS process at N 2 atmosphere. The phase transition of CdS thin film, stress relaxation and optical band gap narrowing were developed by each process. And so, the formation of cadmium oxide was detected after the CdCl 2 heat treatment. It influenced to increase the optical band gap of CdS thin film. The variation in the structure properties, optical properties and residual stresses of CdS thin film was analyzed by X-ray diffractometer (XRD), Raman spectroscopy and ultraviolet (UV)-visible (VIS) spectroscopy.

  16. Improved electrical stability of CdS thin film transistors through Hydrogen-based thermal treatments

    KAUST Repository

    Salas Villaseñor, Ana L.

    2014-06-01

    Thin film transistors (TFTs) with a bottom-gate configuration were fabricated using a photolithography process with chemically bath deposited (CBD) cadmium sulfide (CdS) films as the active channel. Thermal annealing in hydrogen was used to improve electrical stability and performance of the resulting CdS TFTs. Hydrogen thermal treatments results in significant V T instability (V T shift) improvement while increasing the I on/I off ratio without degrading carrier mobility. It is demonstrated that after annealing V T shift and I on/I off improves from 10 V to 4.6 V and from 105 to 10 9, respectively. Carrier mobility remains in the order of 14.5 cm2 V s-1. The reduced V T shift and performance is attributed to a reduction in oxygen species in the CdS after hydrogen annealing, as evaluated by Fourier transform infrared spectroscopy (FTIR). © 2014 IOP Publishing Ltd.

  17. Time and Temperature Dependence of CdS Nanoparticles Grown in a Polystyrene Matrix

    Directory of Open Access Journals (Sweden)

    F. Antolini

    2012-01-01

    Full Text Available Luminescent CdS nanocrystals embedded in a polystyrene matrix were successfully prepared. The in situ growth of CdS QDs was realized by thermal treatment of Cd bis(thiolate/polymer foil at different times and temperatures (240°C and 300°C of annealing, in order to evaluate their influence on the quantum dots growth process. As a general trend, the increasing of time and temperature of annealing induces a rise of the CdS nanocrystals size into the polymeric matrix. The size distribution, morphology, and structure of the CdS nanoparticles were analysed with HRTEM and XRD experiments. UV-Vis and PL data are strongly size-dependent and were used to investigate the particles' growth process, too. The CdS nanoparticles behavior in solution indicated a general trend of QDs to aggregation. This predisposition was clearly displayed by DLS measurements.

  18. PLD-grown thin film saturable absorbers

    Energy Technology Data Exchange (ETDEWEB)

    Tellkamp, Friedjof

    2012-11-01

    The subject of this thesis is the preparation and characterization of thin films made of oxidic dielectrics which may find their application as saturable absorber in passively Q-switched lasers. The solely process applied for fabrication of the thin films was the pulsed laser deposition (PLD) which stands out against other processes by its flexibility considering the composition of the systems to be investigated. Within the scope of this thesis the applied saturable absorbers can be divided into two fundamentally different kinds of functional principles: On the one hand, saturable absorption can be achieved by ions embedded in a host medium. Most commonly applied bulk crystals are certain garnets like YAG (Y{sub 3}Al{sub 5}O{sub 12}) or the spinel forsterite (Mg{sub 2}SiO{sub 4}), in each case with chromium as dopant. Either of these media was investigated in terms of their behavior as PLD-grown saturable absorber. Moreover, experiments with Mg{sub 2}GeO{sub 4}, Ca{sub 2}GeO{sub 4}, Sc{sub 2}O{sub 3}, and further garnets like YSAG or GSGG took place. The absorption coefficients of the grown films of Cr{sup 4+}:YAG were determined by spectroscopic investigations to be one to two orders of magnitude higher compared to commercially available saturable absorbers. For the first time, passive Q-switching of a Nd:YAG laser at 1064 nm with Cr{sup 4+}:YAG thin films could be realized as well as with Cr:Sc{sub 2}O{sub 3} thin films. On the other hand, the desirable effect of saturable absorption can also be generated by quantum well structures. For this purpose, several layer system like YAG/LuAG, Cu{sub 2}O/MgO, and ZnO/corumdum were investigated. It turned out that layer systems with indium oxide (In{sub 2}O{sub 3}) did not only grew in an excellent way but also showed up a behavior regarding their photo luminescence which cannot be explained by classical considerations. The observed luminescence at roughly 3 eV (410 nm) was assumed to be of excitonic nature and its

  19. Study of photoconductivity in Ni doped CdS thin films prepared by spray pyrolysis technique

    Energy Technology Data Exchange (ETDEWEB)

    Patidar, Manju Mishra, E-mail: manjumishra.iuc@gmail.com; Gangrade, Mohan; Nath, R.; Ganesan, V. [UGC-DAE Consortium for Scientific Research, Khandawa Road, Indore 452001 (India); Ajay, Akhil [Physics Department, University of Delhi, Delhi-110007 (India); Wala, Arwa Dewas [Holkar Science College, Indore - 452001 (India); N, Kiran [Physics Department, University of Mysore, Mysore-570005 (India); Panda, Richa [AITR, Bhopal-462044 (India)

    2014-04-24

    Ni-doped cadmium sulphide [Cd{sub 1−x}Ni{sub x}S, (x=0, 0.03, 0.05 and 0.20)] thin films were investigated for photoconductive properties. The films were prepared by spray Pyrolysis technique (SPT). AFM and two probe resistivity measurements were carried out to analyze the morphological and electrical properties of the films. AFM shows the note worthy changes in the morphology where the nanorod structures in CdS is changed into nano particles with the Ni doping. The presence of persistence photo current is demonstrated and extensive photoconductivity analysis has been studied on these films.

  20. Effect of Ag doping on opto-electrical properties of CdS thin films for solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Nazir, Adnan, E-mail: adnan.nazir@iit.it [Istituto Italiano di Tecnologia, Via Morego 30, I-16163 Genova (Italy); School of Chemical and Materials Engineering, National University of Sciences and Technology, Islamabad (Pakistan); Toma, Andrea [Istituto Italiano di Tecnologia, Via Morego 30, I-16163 Genova (Italy); Shah, Nazar Abbas [Department of Physics, COMSATS Institute of Information Technology, Islamabad (Pakistan); Panaro, Simone [Istituto Italiano di Tecnologia, Via Morego 30, I-16163 Genova (Italy); Butt, Sajid [Department of Materials Science and Engineering, Institute of Space Technology (IST), Islamabad 44000 (Pakistan); School of Chemical and Materials Engineering, National University of Sciences and Technology, Islamabad (Pakistan); Sagar, Rizwan ur Rehman [Department of Physics, COMSATS Institute of Information Technology, Islamabad (Pakistan); Raja, Waseem [Istituto Italiano di Tecnologia, Via Morego 30, I-16163 Genova (Italy); Rasool, Kamran [Micro and Nano Devices Group, Department of Metallurgy and Materials Engineering Pakistan, Institute of Engineering and Applied Sciences (PIEAS), P.O. Nilore, Islamabad 45650 (Pakistan); Maqsood, Asghari [Department of Physics, Air University, Islamabad (Pakistan)

    2014-10-01

    Highlights: • Polycrystalline CdS thin films are fabricated by means of Close Spaced Sublimation technique. • Ag is doped by simple ion-exchange technique in order to reduce resistivity of CdS thin films. • Remarkable reduction in resistivity without introducing many transparency losses. - Abstract: Cadmium sulfide (CdS) polycrystalline thin films of different thicknesses (ranging from 370 nm to 750 nm) were fabricated on corning glass substrates using Close Spaced Sublimation (CSS) technique. Optical and electrical investigation revealed that CdS thin films show an appreciable transparency (50–70% transmission) in visible range and a highly resistive behavior (10{sup 6} Ω cm). Samples were doped by silver (Ag) at different concentrations, using ion exchange technique, in order to reduce the resistivity of CdS thin films and to improve their efficiency as a window layer for solar cell application. The doping of Ag in pure CdS thin films resulted into an increase of surface roughness and a decrease both in electrical resistivity and in transparency. By optimizing annealing parameters, we were able to properly control the optical properties of the present system. In fact, the Ag doping of pure CdS films has led to a decrease of the sample resistivity by three orders of magnitude (10{sup 3} Ω cm) against a 20% cut in optical transmission.

  1. Synthesis of nanocrystalline CdS thin film by SILAR and their characterization

    Science.gov (United States)

    Mukherjee, A.; Satpati, B.; Bhattacharyya, S. R.; Ghosh, R.; Mitra, P.

    2015-01-01

    Cadmium sulphide (CdS) thin film was prepared by successive ion layer adsorption and reaction (SILAR) technique using ammonium sulphide as anionic precursor. Characterization techniques of XRD, SEM, TEM, FTIR and EDX were utilized to study the microstructure of the films. Structural characterization by x-ray diffraction reveals the polycrystalline nature of the films. Cubic structure is revealed from X-ray diffraction and selected area diffraction (SAD) patterns. The particle size estimated using X-ray line broadening method is approximately 7 nm. Instrumental broadening was taken into account while particle size estimation. TEM shows CdS nanoparticles in the range 5-15 nm. Elemental mapping using EFTEM reveals good stoichiometric composition of CdS. Characteristic stretching vibration mode of CdS was observed in the absorption band of FTIR spectrum. Optical absorption study exhibits a distinct blue shift in band gap energy value of about 2.56 eV which confirms the size quantization.

  2. Structural and optical properties of nano-structured CdS thin films prepared by chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Bai, Rekha, E-mail: rekha.mittal07@gmail.com; Kumar, Dinesh; Chaudhary, Sujeet; Pandya, Dinesh K. [Thin Film Laboratory, Physics Department, Indian Institute of Technology Delhi, New Delhi-110016 (India)

    2016-05-06

    Cadmium sulfide (CdS) thin films have been deposited on conducting glass substrates by chemical bath deposition (CBD) technique. The effect of precursor concentration on the structural, morphological, compositional, and optical properties of the CdS films has been studied. Crystal structure of these CdS films is characterized by X-ray diffraction (XRD) and it reveals polycrystalline structure with mixture of cubic and wurtzite phases with grain size decreasing as precursor concentration is increased. Optical studies reveal that the CdS thin films have high transmittance in visible spectral region reaching 90% and the films possess direct optical band gap that decreases from 2.46 to 2.39 eV with decreasing bath concentration. Our study suggests that growth is nucleation controlled.

  3. Synthesis and characterization of chemically deposited CdS thin films without toxic precursors.

    Science.gov (United States)

    Fernández-Pérez, A.; Sandoval-Paz, M. G.

    2016-05-01

    Al doped and undoped CdS thin films (CdS:Al) were deposited on glass, copper and bronze substrates by chemical bath deposition technique in an ammonia-free cadmium-sodium citrate system. The structural and optical properties of the CdS films were determined by X-ray diffraction (XRD), scanning electron microscope (SEM), and simultaneous transmission- reflection spectroscopy. It was found that the properties of the films depend on the amount of Al in the growth solutions and deposition time. The increase in Al content in the reaction solution led to a smaller crystallite size and higher energy band gap that varies in the range 2.42 eV - 2.59 eV depending on the Al content.

  4. Decoupling interface effect on the phase stability of CdS thin films by van der Waals heteroepitaxy

    Science.gov (United States)

    Sun, Xin; Wang, Yiping; Seewald, Lucas J.; Chen, Zhizhong; Shi, Jian; Washington, Morris A.; Lu, Toh-Ming

    2017-01-01

    Wurtzite (W) and zinc-blende (ZB) polytypism has long been observed in epitaxial CdS thin films. The present work, based on van der Waals epitaxial CdS thin films, is an attempt to explain which crystal modification, W or ZB, is favored under different growth conditions. In this van der Waals epitaxy system where the substrate influence is considered weak, it is found that the substrate temperature plays a crucial role in determining the crystal modification of CdS, that is, W and ZB CdS are more stable at low and high ends of substrate temperature, respectively. We attribute this temperature effect to the entropy difference (SW benefit in terms of high density of bonding contributed by the substrate-film interface is believed to be too overwhelming for the intrinsic entropy difference to overcome. Furthermore, the deposition rate is found to affect the crystalline quality and strain level in CdS films but not the crystal modification of the CdS films. Last, Raman and photoluminescence spectroscopies reveal the strain behaviors in the films. The phase change from W to ZB CdS is well-correlated with the observed peak shifts in Raman and photoluminescence spectroscopies.

  5. Preparation, structural and optical characterization of nanocrystalline CdS thin film

    Science.gov (United States)

    Abdel-Galil, A.; Balboul, M. R.; Atta, A.; Yahia, I. S.; Sharaf, A.

    2014-08-01

    Nano-structured CdS thin film was deposited onto a glass substrate by an electron beam evaporation technique at room temperature from a powder prepared by a hydrothermal method. The morphology and structural properties of the as-deposited film were characterized using atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. The AFM morphology study confirms that the CdS thin film has nano-sized grains and a dense morphology. The mean particle size that resulted from XRD analyses was 8.4 nm. Also, the XRD patterns show that CdS powder and thin film have hexagonal wurtzite type structure with a preferred c-axis orientation along (002) plane. The refractive index and the film thickness were obtained using the Swanepoel method from transmission spectrum. The optical band gap was calculated from the absorption spectrum, and was found to be 2.41 eV corresponding to direct optical transition. The dispersion of the refractive index was explained using a single oscillator model. The dielectric relaxation time and the optical conductivity were determined and studied with photon energy.

  6. Physical properties of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ximello-Quiebras, J.N.; Contreras-Puente, G.; Aguilar-Hernandez, J. [Escuela Superior de Fisica y Matematicas-Instituto Politecnico Nacional, Edificio 9, U.P.A.L.M. 07738 DF (Mexico); Santana-Rodriguez, G.; Arias-Carbajal Readigos, A. [Facultad de Fisica IMRE, Universidad de la Habana, 10400 La Habana (Cuba)

    2004-05-01

    Cadmium sulfide films of different thicknesses were deposited by chemical bath deposition (CBD) from a bath containing cadmium chloride, ammonium chloride, ammonium hydroxide and thiourea. The XRD patterns show that the films have a hexagonal phase with a preferential (002) orientation. The photoluminescence spectra show a defect structure, characteristics of the CdS films obtained by CBD. The electrical behavior in dark and under illumination, the optical properties and the band gap value reported in this work is in agreement with that reported in the literature.

  7. Highly photoconducting O2-doped CdS films deposited by spray pyrolysis

    Science.gov (United States)

    Richards, D.; El-Korashy, A. M.; Stirn, R. J.; Karulkar, P. C.

    1984-01-01

    CdS films have been prepared by spraying in air solutions of thiourea with either cadmium chloride or cadmium acetate with varying mole ratio and substrate temperature, and subsequently heat treating in oxygen. Substrates included both bare glass or sapphire and transparent conducting oxide-coated sapphire for electrical measurements lateral and transverse to the CdS plane, respectively. Dark resistances of over 10 to the 14th ohms and light-to-dark conductivities of up to 10 to the 7th were obtained using uncoated substrates. The use of Cd(C2H3O2)2 in place of CdCl2 greatly increased the speed of response although with some sacrifice in photoconductivity. Deposition of CdS on ITO-coated surfaces led to greatly reduced dark resistances for the case of CdCl2, but not Cd(C2H3O2)2, presumably due to HCl reaction with the ITO coating in the course of spraying with the former. Ion microprobe analysis detected indium within the CdS films exhibiting low dark resistance. Measurements of the dark and light conductivities at temperatures down to 77 K are given as are the response times for unetched and HCl-etched surfaces.

  8. Optical Parameters of Spray-Deposited CdS1- y Te y Thin Films

    Science.gov (United States)

    Ikhmayies, Shadia J.

    2017-02-01

    CdS x Te1- x and CdS1- y Te y solid solutions are usually formed in the interfacial region in CdS/CdTe solar cells during the deposition of the CdTe layer and/or the processing steps of the device. In this work, indium-doped CdS1- y Te y thin films were prepared by first producing CdS:In thin films by the spray pyrolysis technique on glass substrates, then annealing the films in nitrogen atmosphere in the presence of elemental tellurium. The films were characterized by scanning electron microscopy, energy dispersive x-ray spectroscopy, and transmittance measurements. The transmittance was used to deduce the reflectance from which the optical parameters were computed. The extinction coefficient, refractive index, the real and imaginary parts of the dielectric constant, optical conductivity, and energy loss were computed, and their dependence on the composition was investigated. In addition, the dispersion of the refractive index was analyzed by the single oscillator model, and dispersion parameters were investigated.

  9. Optical Parameters of Spray-Deposited CdS1-y Te y Thin Films

    Science.gov (United States)

    Ikhmayies, Shadia J.

    2016-11-01

    CdS x Te1-x and CdS1-y Te y solid solutions are usually formed in the interfacial region in CdS/CdTe solar cells during the deposition of the CdTe layer and/or the processing steps of the device. In this work, indium-doped CdS1-y Te y thin films were prepared by first producing CdS:In thin films by the spray pyrolysis technique on glass substrates, then annealing the films in nitrogen atmosphere in the presence of elemental tellurium. The films were characterized by scanning electron microscopy, energy dispersive x-ray spectroscopy, and transmittance measurements. The transmittance was used to deduce the reflectance from which the optical parameters were computed. The extinction coefficient, refractive index, the real and imaginary parts of the dielectric constant, optical conductivity, and energy loss were computed, and their dependence on the composition was investigated. In addition, the dispersion of the refractive index was analyzed by the single oscillator model, and dispersion parameters were investigated.

  10. Subatomic deformation driven by vertical piezoelectricity from CdS ultrathin films

    Science.gov (United States)

    Wang, Xuewen; He, Xuexia; Zhu, Hongfei; Sun, Linfeng; Fu, Wei; Wang, Xingli; Hoong, Lai Chee; Wang, Hong; Zeng, Qingsheng; Zhao, Wu; Wei, Jun; Jin, Zhong; Shen, Zexiang; Liu, Jie; Zhang, Ting; Liu, Zheng

    2016-01-01

    Driven by the development of high-performance piezoelectric materials, actuators become an important tool for positioning objects with high accuracy down to nanometer scale, and have been used for a wide variety of equipment, such as atomic force microscopy and scanning tunneling microscopy. However, positioning at the subatomic scale is still a great challenge. Ultrathin piezoelectric materials may pave the way to positioning an object with extreme precision. Using ultrathin CdS thin films, we demonstrate vertical piezoelectricity in atomic scale (three to five space lattices). With an in situ scanning Kelvin force microscopy and single and dual ac resonance tracking piezoelectric force microscopy, the vertical piezoelectric coefficient (d33) up to 33 pm·V−1 was determined for the CdS ultrathin films. These findings shed light on the design of next-generation sensors and microelectromechanical devices. PMID:27419234

  11. Subatomic deformation driven by vertical piezoelectricity from CdS ultrathin films.

    Science.gov (United States)

    Wang, Xuewen; He, Xuexia; Zhu, Hongfei; Sun, Linfeng; Fu, Wei; Wang, Xingli; Hoong, Lai Chee; Wang, Hong; Zeng, Qingsheng; Zhao, Wu; Wei, Jun; Jin, Zhong; Shen, Zexiang; Liu, Jie; Zhang, Ting; Liu, Zheng

    2016-07-01

    Driven by the development of high-performance piezoelectric materials, actuators become an important tool for positioning objects with high accuracy down to nanometer scale, and have been used for a wide variety of equipment, such as atomic force microscopy and scanning tunneling microscopy. However, positioning at the subatomic scale is still a great challenge. Ultrathin piezoelectric materials may pave the way to positioning an object with extreme precision. Using ultrathin CdS thin films, we demonstrate vertical piezoelectricity in atomic scale (three to five space lattices). With an in situ scanning Kelvin force microscopy and single and dual ac resonance tracking piezoelectric force microscopy, the vertical piezoelectric coefficient (d 33) up to 33 pm·V(-1) was determined for the CdS ultrathin films. These findings shed light on the design of next-generation sensors and microelectromechanical devices.

  12. Cu doping concentration effect on the physical properties of CdS thin films obtained by the CBD technique

    Science.gov (United States)

    Albor Aguilera, M. L.; Flores Márquez, J. M.; Remolina Millan, A.; Matsumoto Kuwabara, Y.; González Trujillo, M. A.; Hernández Vásquez, C.; Aguilar Hernandez, J. R.; Hernández Pérez, M. A.; Courel-Piedrahita, M.; Madeira, H. T. Yee

    2017-08-01

    Cu(In, Ga)Se2 (CIGS) and Cu2ZnSnS4 (CZTS) semiconductors are direct band gap materials; when these types of material are used in solar cells, they provide efficiencies of 22.1% and 12.6%, respectively. Most traditional fabrication methods involve expensive vacuum processes including co-evaporation and sputtering techniques, where films and doping are conducted separately. On the other hand, the chemical bath deposition (CBD) technique allows an in situ process. Cu-doped CdS thin films working as a buffer layer on solar cells provide good performing devices and they may be deposited by low cost techniques such as chemical methods. In this work, Cu-doped CdS thin films were deposited using the CBD technique on SnO2:F (FTO) substrates. The elemental analysis and mapping reconstruction were conducted by EDXS. Morphological, optical and electrical properties were studied, and they revealed that Cu doping modified the CdS structure, band-gap value and the electrical properties. Cu-doped CdS films show high resistivity compared to the non-doped CdS. The appropriate parameters of Cu-doped CdS films were determined to obtain an adequate window or buffer layer on CIGS and CZTS photovoltaic solar cells.

  13. CdS nanofilms: Effect of film thickness on morphology and optical band gap

    Science.gov (United States)

    Kumar, Suresh; Kumar, Santosh; Sharma, Pankaj; Sharma, Vineet; Katyal, S. C.

    2012-12-01

    CdS nanofilms of varying thickness (t) deposited by chemical bath deposition technique have been studied for structural changes using x-ray diffractometer (XRD) and transmission electron microscope (TEM). XRD analysis shows polycrystalline nature in deposited films with preferred orientation along (002) reflection plane also confirmed by selected area diffraction pattern of TEM. Uniform and smooth surface morphology observed using field emission scanning electron microscope. The surface topography has been studied using atomic force microscope. The optical constants have been calculated from the analysis of %T and %R spectra in the wavelength range 300 nm-900 nm. CdS nanofilms show a direct transition with red shift. The optical band gap decreases while the refractive index increases with increase in thickness of nanofilms.

  14. Growth, Optical and Electirical Properties of In2S3, In1-xCdxS and CdS Thin Films by the (SILAR) Method

    Science.gov (United States)

    Kundakçi, M.; Akaltun, Y.; Astam, A.; Ateş, A.; Yildirim, M.; Gürbulak, B.

    2007-04-01

    In2S3 and In1-xCdxS and CdS thin films were grown on glass substrates by using Successive Ionic Layer Adsorption and Reaction (SILAR) technique at room temperature. The band gap energies of the films were determined by optical absorption measurements. The optical absorption measurements were done as a function of the in the 10-320 K temperature range. It has been seen that, the band gap energies of the In2S3, In1-xCdxS and CdS are decreasing with in increasing temperature. The electrical characterization was done by current-voltage measurements with two probe method. The electrical resistivity measurements were done as a function of the in the 300-450 K temperature range. The electrical resistivity are decreasing with in increasing temperature. The resistivity were calculated at 300 K and 450 K, as 2×106 Ωcm and 1×104 Ωcm, 1,5×107 and 5,4×103, 1,5×107 and 1,2×104 Ωcm for CdS, In1-xCdxS, In2S3, respectively.

  15. Photocatalytic degradation of methyl orange over ITO/Cds/ZnO interface composite films.

    Science.gov (United States)

    Wei, Shouqiang; Shao, Zhongcai; Lu, Xudong; Liu, Ying; Cao, Linlin; He, Yan

    2009-01-01

    ITO/CdS/ZnO interface composite films were successfully prepared by subsequent electrodeposition of CdS and ZnO onto indium tin oxide (ITO) glass substrates. The obtained ITO/CdS/ZnO composite films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), and UV-Vis spectroscopy. The photocatalytic activity of ITO/CdS/ZnO composite films were investigated using methyl orange (MO) as a model organic compound under UV light irradiation. The influence of operating parameters on MO degradation including initial concentration of MO, pH value of solution, and inorganic anion species over the composite films were examined. A blue shift of absorption threshold was observed for the ITO/CdS/ZnO film in comparison with ITO/ZnO film. ITO/CdS/ZnO composite films prepared under specific conditions showed a higher photocatalytic activity than that of ITO/ZnO films. It was also found that the photocatalytic degradation of MO on the composite films followed pseudo-first order kinetics.

  16. Thin multilayer CdS/ZnS films grown by SILAR technique

    Science.gov (United States)

    Valkonen, Mika P.; Lindroos, Seppo; Kanniainen, Tapio; Leskelä, Markku; Tapper, Unto; Kauppinen, Esko

    1997-11-01

    Multilayer ZnS/CdS thin films were grown on glass, ITO-covered glass and (100)GaAs substrates by successive ionic layer adsorption and reaction (SILAR) technique at room temperature and ambient pressure. The layers in multilayer thin film structures were nominally 1-6 nm thick and the amount of layers varied so that the total thickness of 100-120 nm was achieved. The films were polycrystalline according to X-ray diffraction analysis and scanning electron microscopy. The interfaces between the separate cadmium sulfide (CdS) and zinc sulfide (ZnS) layers were not sharp, but contained thin Cd xZn 1- xS solid solution layers. Annealing enhanced the mixing of the different layers and after 50 h at 300°C no separate CdS and ZnS X-ray reflections could be detected. About 20 nm thick layers could be detected as separate fields by scanning electron microscopy.

  17. Sub-THz thermally activated-electrical conductivity of CdS thin films

    Science.gov (United States)

    Rahman, Rezwanur; Scales, John A.

    2016-08-01

    The electrical conductivity of a CdS thin film controlled by grain structures is essential to enhance its photoconductivity to be able to be fit as a window material in CdS/CdTe heterojunction solar cells. In order to characterize a thin film, electromagnetically, we employed an open cavity resonator with a sub-millimeter Vector Network Analyzer. Our technique is capable of measuring complex dielectric permittivity, ɛ ˜ , of a photovoltaic film as thin as 0.1 μm. We measured the real part of the complex dielectric permittivity, ɛre, and electrical conductivity, σre (derived from the imaginary part, ɛim), of unannealed and annealed CdS films with thicknesses ˜0.15 μm on ˜3 mm thick-borosilicate glass substrates, at room temperature. We obtain the (thermally activated) electrical conductivity between 100 and 312 GHz, which is less in annealed samples than in unannealed ones by ˜2 orders of magnitude. Contrary to our expectations, the carrier concentrations extracted from these data by fitting a Drude model are ˜1016 cm-3 (unannealed) and ˜1014 cm-3 (annealed). We investigate the connection between the grain size and carrier concentration.

  18. Dependence of electro-optical properties on the deposition conditions of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Lately, there has been a sharp increase in the publication of papers on chemical bath deposition of CdS thin films and related materials due to successful results obtained using this method to fabricate CdS thin-film buffer layers for CuInSe{sub 2}- and CdTe-based polycrystalline thin-film solar cells. Generally, these papers focus on previously proposed methods of studying film characteristics without a systematic study of the influence of deposition conditions on film characteristics. In this paper the authors present an exhaustive study of the chemical bath-deposited CdS thin films electro-optical properties dependence on deposition variables. The authors propose not only a set of conditions for obtaining CdS thin films by this method but additionally, suitable deposition process conditions for certain application requirements, such as buffer layers for thin-film solar cells. The observed electro-optical characteristics dependence on the deposition variables corroborates the chemical mechanism that they proposed previously for this process.

  19. Photoluminescence and electrical properties of polyvinyl alcohol films doped with CdS nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Ali, Z.I.; Hosni, H.M.; Saleh, H.H.; Ghazy, O.A. [Atomic Energy Authority, National Center for Radiation Research and Technology, P.O. Box 29, Nasr City, Cairo (Egypt)

    2016-05-15

    In situ preparation of polyvinyl alcohol (PVA) films doped with cadmium sulfide (CdS) nanoparticles was conducted by gamma radiation. The films were characterized in terms of photoluminescence and electrical conductivity. The photoluminescence results indicated the existence of two emission peaks around 470 and 530 nm, which are due to electron-hole recombination of CdS nanoparticles and surface trapped emission due to the PVA capping, respectively. DC electrical conductivity (σ {sub DC}) measurement in the temperature range from 303 up to 373 K reveals an increase in its value with increasing both Cd{sup 2+} ion molar concentration and irradiation dose. AC electrical conductivity (σ {sub AC}) measurement over the same temperature range at an applied field frequency of 10, 100, 500 and 1000 kHz shows an increase behavior with increasing temperature, frequency, Cd{sup 2+} ion molar concentration and irradiation dose. Dielectric constant (ε {sub 1}) exhibits an increase with temperature, whereas it shows reduced values with increasing frequency, Cd{sup 2+} ion molar concentration and irradiation dose. Also, the dielectric loss tangent (tan δ) follows an increasing trend with increasing temperature, Cd{sup 2+} ion molar concentration and irradiation dose while it has an opposite trend with increasing frequency. The CdS/PVA nanocomposite films behavior could be explained on the basis of formation of charge-transfer complexes (CTCs) by the CdS nanoparticles doped into the PVA matrix and the role of radiation in enhancing the charge carrier mobility of such CTCs. (orig.)

  20. Electrical Response of CdS Thin Film and CdS/Si Heterojunction to Gamma Radiation

    Directory of Open Access Journals (Sweden)

    M. R. Balboul

    2016-01-01

    Full Text Available Gamma irradiation method has been used to change the electrical properties of CdS thin film. A specific dose of γ-irradiation increases the activation energy of CdS thin film. In addition, γ-irradiation was used to change the sign of Hall coefficient, RH, of CdS thin film from negative to positive irrespective of temperature. The Hall mobility mechanism shows noticeable change after γ-irradiation from decreasing to increasing with raising the temperature. In depth, analysis was done using capacitance-voltage measurement in order to realize the modification in the CdS/Si junction band gap after γ-irradiation. Several parameters were also studied such as charge carrier concentration, ND, and flat band potential, Vfb. The γ-irradiation was found to increase the concentration of the deep traps within the band gap of the CdS/Si heterojunction.

  1. Effect of annealing temperature on structural and Raman spectroscopy analysis of nanostructured CdS thin films

    Science.gov (United States)

    Venkata Veera Prasad, M.; Thyagarajan, K.; Kumar, B. Rajesh

    2016-09-01

    Nanocrystalline CdS thin films were deposited on glass substrates using the sol-gel spin coating method. The structural properties and surface morphology of the CdS thin films were characterized by X-ray diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM) and Atomic force microscopy (AFM). XRD studies revealed that all the films exhibit cubic structure with a (1 1 1) preferential orientation. The diffraction peak (1 1 1) shifts towards higher 20 value with increasing annealing temperature from 150 oC to 350 oC. The Raman spectra shows the intense and broad peaks at ∼302 and ∼603.5cm-1 which are assigned to fundamental optical phonon mode (LO) and first over tone mode (2LO) of CdS.

  2. Role of the buffer solution in the chemical deposition of CdS films for CIGS solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Sooho; Kim, Donguk; Baek, Dohyun; Hong, Byoungyou; Yi, Junsin; Lee, Jaehyeong [Sungkyunkwan University, Suwon (Korea, Republic of); Park, Yongseob [Chosun College of Science and and Technology, Gwangju (Korea, Republic of); Choi, Wonseok [Hanbat National University, Daejeon (Korea, Republic of)

    2014-05-15

    In this work, the effects of NH{sub 4}Ac on the structural and the electro-optical properties of CdS films were investigated. CdS thin films were deposited on soda-lime glass and indium-tin-oxide (ITO) coated glass from a chemical bath containing 0.025 M cadmium acetate, 0 M ∼ 0.2 M ammonium acetate, 0.5 M thiourea, and ammonia. Cadmium acetate was the cadmium source, ammonium acetate served as a buffer, ammonia was the complexing agent, and thiourea was the source of sulfur. A commonly- available chemical bath deposition system was successfully modified to obtain precise control over the pH of the solution at 75 .deg. C during the deposition. Chemically deposited CdS films were studied by using field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), optical transmittance, and electrical resistivity measurements.

  3. Photovoltaic devices based on electrochemical-chemical deposited CdS and poly3-octylthiophene thin films

    Energy Technology Data Exchange (ETDEWEB)

    Hu, Hailin [Departamento de Materiales Solares, Centro de Investigacion en Energia, Universidad Nacional Autonoma de Mexico, Priv.Xochicalco S/N, Temixco, Morelos 62580 (Mexico); University of California, Natural Science II, Irvine, CA 92697 (United States); Kung, Sheng-Chin; Yang, Li-Mei; Penner, Reginald M. [University of California, Natural Science II, Irvine, CA 92697 (United States); Nicho, M.E. [Centro de Investigacion en Ingenieria y Ciencias Aplicadas, Universidad Autonoma del Estado de Morelos, Av. Universidad 1001, Chamilpa, Morelos 62110 (Mexico)

    2009-01-15

    Cadmium sulfide (CdS) is a well-known wide bandgap semiconductor for solar cell applications. In this work we report an electrochemical/chemical method to prepare CdS thin films on gold (Au)-coated glass substrates. 10 nm thick of titanium (Ti) film was first sputtered on glass surface to improve the adhesion between the subsequent sputtered Au film and the glass surface. Cadmium films were then electrochemically deposited on Au surface in an acidic solution with negative potential, and the obtained glass/Ti/Au/Cd samples were annealed in H{sub 2}S atmosphere to convert Cd into CdS. XRD pattern of H{sub 2}S-annealed Cd samples shows a hexagonal wurtzite phase in CdS with (0 0 2) as the preferential crystalline plane. Photovoltaic properties were clearly shown in hybrid heterojunctions of CdS and poly3-octylthiophene (P3OT) with Au as the top and the back metal contacts. (author)

  4. High-refractive Index Nanocomposite Films Of Polyvinyl-pyrolidone And CdS Nanoparticles By In-Situ Thermolysis

    Science.gov (United States)

    Chaudhuri, Tapas K.; Patel, Mitesh G.

    2010-12-01

    A simple and rapid process for deposition of high refractive index films of CdS/PVP nanocomposite is described. CdS/PVP films are prepared on glass substrate by dip coating a precursor film from methanolic solution of thio-organic complex of cadmium and PVP and subsequent heating at 180° C in air for 10 min. The transmission spectra of the films (thickness ˜700 nm) in the wavelength range 300 to 1000 nm showed an absorption edge near 500 nm due to CdS and high transmission of 85% beyond 500 nm. The refractive index is found to be 1.74 by Swanepoel method, which is between that of PVP (1.48) and CdS (2.5). Transmission Electron Microscopy showed that PVP matrix contains 5 to 10 nm CdS nanocrystals. X-ray and electron diffraction revealed the formation of cubic CdS nanoparticles in PVP. Fourier Transform Infrared spectroscopy of the composite showed that there is a strong interaction between CdS nanocrystals and PVP.

  5. Cu-doped CdS and its application in CdTe thin film solar cell

    Science.gov (United States)

    Deng, Yi; Yang, Jun; Yang, Ruilong; Shen, Kai; Wang, Dezhao; Wang, Deliang

    2016-01-01

    Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the VCd- and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl2 annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  6. Cu-doped CdS and its application in CdTe thin film solar cell

    Directory of Open Access Journals (Sweden)

    Yi Deng

    2016-01-01

    Full Text Available Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the VCd− and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl2 annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  7. Cu-doped CdS and its application in CdTe thin film solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Deng, Yi [School of Automation, Wuhan University of Technology, Wuhan, Hubei 430070 (China); College of Electronic and Information Engineering, Hankou University, Wuhan, Hubei 430212 (China); Yang, Jun; Yang, Ruilong; Shen, Kai; Wang, Dezhao [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026 (China); Wang, Deliang, E-mail: eedewang@ustc.edu.cn [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, Anhui 230026 (China); Key Laboratory of Materials for Energy Conversion, University of Science and Technology of China, Hefei, Anhui 230026 (China)

    2016-01-15

    Cu is widely used in the back contact formation of CdTe thin film solar cells. However, Cu is easily to diffuse from the back contact into the CdTe absorber layer and even to the cell junction interface CdS/CdTe. This phenomenon is generally believed to be the main factor affecting the CdTe solar cell stability. In this study Cu was intentionally doped in CdS thin film to study its effect on the microstructural, optical and electrical properties of the CdS material. Upon Cu doping, the V{sub Cd{sup −}} and the surface-state-related photoluminescence emissions were dramatically decreased/quenched. The presence of Cu atom hindered the recrystallization/coalescence of the nano-sized grains in the as-deposited CdS film during the air and the CdCl{sub 2} annealing. CdTe thin film solar cell fabricated with Cu-doped CdS window layers demonstrated much decreased fill factor, which was induced by the increased space-charge recombination near the p-n junction and the worsened junction crystalline quality. Temperature dependent current-voltage curve measurement indicated that the doped Cu in the CdS window layer was not stable at both room and higher temperatures.

  8. Effect of Annealing on the Properties of Nanocrystalline CdS Thin Films Prepared by CBD Method

    Directory of Open Access Journals (Sweden)

    A. Djelloul

    2016-06-01

    Full Text Available The CdS thin films were deposited on glass substrate by chemical bath deposition (CBD. The effect of annealing temperature on the morphological, structural, optical and electrical properties of the crystalline CdS films were investigated for different annealing temperature (as deposited, 300, 400 and 500 °C.The annealing time is 1 h. The materials have been prepared using simple aqueous solutions containing cadmium sulfate, as source of cadmium, and thiourea as source of sulfur and ammonium hydroxide as the complexing agent. The temperature of the bath was maintained at low temperature of 80 °C. The surface morphological properties studied by SEM and AFM respectively. The structural properties of CdS thin film was studied by X-ray diffraction. The optical parameter such as transmittance and energy band gap of the films with thermal annealing temperature was investigated by UV-Visible spectrophotometer. The variation of band gap values of CdS thin film samples were found to be in the range of 2.37 to 2.5 eV. Electrical resistivity measurements were carried out in four-probe Van Der Pauw geometry at room temperature by the Hall measurement. SEM image confirmed that film of smooth surface morphology.

  9. Structural and optical properties of Ni-doped CdS thin films prepared by chemical bath deposition method

    Energy Technology Data Exchange (ETDEWEB)

    Premarani, R. [Arumugam Pillai SeethaiAmmal College, Thiruppattur-630211 (India); Saravanakumar, S., E-mail: sarophy84@gmail.com; Chandramohan, R. [SreeSevuganAnnamalai College, Devakottai-630303 (India); Mahalingam, T. [Department of Electrical and Computer Engineering, Ajou University, Suwon 443-749 (Korea, Republic of)

    2015-06-24

    The structural and optical behavior of undoped Cadmiun Sulphide (CdS) and Ni-doped CdS thinfilms prepared by Chemical Bath Deposition (CBD) technique is reported. The crystallite sizes of the thinfilms have been characterized by X-ray diffraction pattern (XRD). The particle sizes increase with the increase of Ni content in the CdS thinfilms. Scanning Electron Microscope (SEM) results indicated that CdS thinfilms is made up of aggregate of spherical-like particles. The composition was estimated by Energy Dispersive Analysis of X-ray (EDX) and reported. Spectroscopic studies revealed considerable improvement in transmission and the band gap of the films changes with addition of Ni dopant that is associated with variation in crystallite sizes in the nano regime.

  10. Effect of Annealing on the Properties of Nanocrystalline CdS Thin Films Prepared by CBD Method

    OpenAIRE

    2016-01-01

    The CdS thin films were deposited on glass substrate by chemical bath deposition (CBD). The effect of annealing temperature on the morphological, structural, optical and electrical properties of the crystalline CdS films were investigated for different annealing temperature (as deposited, 300, 400 and 500 °C).The annealing time is 1 h. The materials have been prepared using simple aqueous solutions containing cadmium sulfate, as source of cadmium, and thiourea as source of sulfur and ammoniu...

  11. Occurrence of single-electron phenomenon in CdS nanoclusters in Langmuir-Blodgett films of -octadecyl succinic acid

    Indian Academy of Sciences (India)

    G Hemakanthi; Aruna Dhathathreyan

    2002-10-01

    Cadmium complex of -octadecyl succinic acid (ODSA) in Langmuir films at air/water interface has been studied using surface pressure-molecular area ( - ) and surface potential-molecular area ( - ) isotherms. The metal complex formed, transferred as LB film onto solid substrates, was analysed using FT-IR and was subjected to sulphidation reaction. Antisymmetric and symmetric carboxylate stretching vibrations have been used to determine the nature of the ODSA/cation complexes. CdS formed after sulphidation of the cadmium complex (ODSACd) showed possible single-electron phenomenon indicating the nanosized nature of clusters formed. Atomic Force Microscopy (AFM) measurements carried out confirmed the size of these CdS clusters.

  12. Structural analysis of CdS thin films obtained by multiple dips of oscillating chemical bath

    Energy Technology Data Exchange (ETDEWEB)

    Gutierrez Lazos, C.D. [Seccion de Electronica del Estado Solido, Centro de Investigacion y de Estudios Avanzados, Av. Instituto Politecnico Nacional 2508, Col. San Pedro Zacatenco, 07360 Mexico, D.F. (Mexico); Rosendo, E., E-mail: erosendo@siu.buap.m [Centro de Investigacion en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur y San Claudio, Col. San Manuel, C.P. 72570, Puebla (Mexico); Ortega, M. [Seccion de Electronica del Estado Solido, Centro de Investigacion y de Estudios Avanzados, Av. Instituto Politecnico Nacional 2508, Col. San Pedro Zacatenco, 07360 Mexico, D.F. (Mexico); Oliva, A.I. [Departamento de Fisica Aplicada, Centro de Investigacion y de Estudios Avanzados, Unidad Merida, A.P. 73 Cordemex, 97310 Merida, Yucatan (Mexico); Tapia, O.; Diaz, T.; Juarez, H.; Garcia, G. [Centro de Investigacion en Dispositivos Semiconductores, Universidad Autonoma de Puebla, 14 Sur y San Claudio, Col. San Manuel, C.P. 72570, Puebla (Mexico); Rubin, M. [Facultad de Ciencias de la Computacion, 14 Sur y San Claudio, Col. San Manuel, C.P. 72570, Puebla (Mexico)

    2009-11-25

    Highly oriented CdS thin films with thicknesses greater than 1 mum were deposited by multiple dips, using oscillating chemical bath deposition (OCBD) at the bath temperature of 75 deg. C, and deposition time ranging from 15 to 75 min for a single dip. Samples with different thickness were prepared by repeating the deposition process for two and three times. The films deposited by a single dip have the alpha-greenockite structure showing the (0 0 2) as preferred orientation, as indicated by the X-ray diffraction measurements. This notable characteristic is preserved in the samples obtained from two or three dips. The crystallite size for the samples deposited by a single dip depends on the deposition time, because it varied from 23 to 37 nm as the deposition time increased. Nevertheless for samples deposited by two and three dips, the grain size shows no noticeable change, being about 22 nm.

  13. Synthesis of nanocrystalline CdS thin films in PVA matrix

    Indian Academy of Sciences (India)

    R Devi; P Purkayastha; P K Kalita; B K Sarma

    2007-04-01

    Nanocrystalline thin films of CdS are deposited on glass substrates by chemical bath deposition technique using polyvinyl alcohol (PVA) matrix solution. Crystallite sizes of the nanocrystalline films are determined from broadening of X-ray diffraction lines and are found to vary from 5.4–10.2 nm. The band gap of the nanocrystalline material is determined from the UV spectrograph. The absorption edge is shifted towards the lower wave length side (i.e. blue shift) and are found to be within the range from 2.48–2.8 eV as grain sizes decrease from 10.2–5.4 nm. This is also supported by the spectral response curves. An increase of molarity decreases the grain size which in turn increases the band gap.

  14. Barium Ferrite Films Grown by Laser Ablation

    NARCIS (Netherlands)

    Lisfi, A.; Lodder, J.C.; Haan, de P.; Smithers, M.A.; Roesthuis, F.J.G.

    1998-01-01

    Pulsed laser ablation (PLA) has been used to grow barium ferrite films on Al2O3 single crystal substrates. When deposition occurs in an oxidising atmosphere at high temperatures, the films are single BaFe12O19 phase, very well oriented with (001) texture, and exhibit a large perpendicular magnetic a

  15. CdS quantum dots sensitized Cu doped ZnO nanostructured thin films for solar cell applications

    Science.gov (United States)

    Poornima, K.; Gopala Krishnan, K.; Lalitha, B.; Raja, M.

    2015-07-01

    ZnO nanorods and Cu doped ZnO nanorods thin films have been prepared by simple hydrothermal method. CdS quantum dots are sensitized with Cu doped ZnO nanorod thin films using successive ionic layer adsorption and reaction (SILAR) method. The X-ray diffraction study reveals that ZnO nanorods, and CdS quantum dot sensitized Cu doped ZnO nanorods exhibit hexagonal structure. The scanning electron microscope image shows the presence of ZnO nanorods. The average diameter and length of the aligned nanorod is 300 nm and 1.5 μm respectively. The absorption spectra shows that the absorption edge of CdS quantum dot sensitized ZnO nanorod thin film is shifted toward longer wavelength region when compared to the absorption edge of ZnO nanorods film. The conversion efficiency of the CdS quantum dot sensitized Cu doped ZnO nanorod thin film solar cell is 1.5%.

  16. SERS-applicable silver nanoisland film grown under protective coating

    Science.gov (United States)

    Reduto, I.; Chervinskii, S.; Matikainen, A.; Baklanov, A.; Kamenskii, A.; Lipovskii, A.

    2014-10-01

    We have used recently developed out-diffusion technique of growing silver nanoisland films on glass surface to grow silver nanoislands under TiO2 layer deposited on the glass. After covering the surface of silver ion-exchanged glasses with TiO2 film using atomic layer deposition technique and subsequent thermal processing of the samples in hydrogen their optical absorption spectra demonstrate the absorption peak corresponding to surface plasmon resonance in grown silver nanoislands. The spectral position of the peak is shifted relatively to the peak observed in the spectra of the nanoisland film grown on the surface of ion exchanged and annealed glass samples without dielectric cover. The applicability of the silver nanoislands grown under several nm thick protective TiO2 coating in surface-enhanced Raman scattering spectroscopy is demonstrated.

  17. Spin-coating deposition of PbS and CdS thin films for solar cell application

    Energy Technology Data Exchange (ETDEWEB)

    Patel, Jayesh; Mighri, Frej [Laval University, CREPEC, Department of Chemical Engineering, Quebec, QC (Canada); Ajji, Abdellah [Ecole Polytechnique, CREPEC, Chemical Engineering Department, Montreal, QC (Canada); Tiwari, Devendra; Chaudhuri, Tapas K. [Charotar University of Science and Technology (CHARUSAT), Dr. K.C. Patel Research and Development Centre, Anand District, Gujarat (India)

    2014-12-15

    In this work, we describe a simple spin-coating deposition technique for lead sulphide (PbS) and cadmium sulphide (CdS) films from a methanolic metal-thiourea complex. The characterization of the films by X-ray diffraction and X-ray photoelectron spectroscopy techniques revealed that pure cubic phase PbS and CdS layers were formed via this method. As shown by atomic force microscopy and scanning electron microscopy results, both films were homogeneous and presented a smooth surface. Optical properties showed that the energy band gap of PbS and CdS films were around 1.65 and 2.5 eV, respectively. The PbS film is p-type in nature with an electrical conductivity of around 0.8 S/cm. The hole concentration and mobility were 2.35 x 10{sup 18} cm{sup -3} and 2.16 x 10{sup -3} cm{sup 2}/V/s, respectively, as determined from Hall measurement. Both films were used to develop a thin film solar cell device of graphite/PbS/CdS/ITO/glass. Device characterization showed the power conversion efficiency of around 0.24 %. The corresponding open circuit voltage, short circuit current and fill factor were 0.570 V, 1.32 mA/cm{sup 2} and 0.32, respectively. (orig.)

  18. Substrate temperature dependent studies on properties of chemical spray pyrolysis deposited CdS thin films for solar cell applications

    Science.gov (United States)

    Diwate, Kiran; Pawbake, Amit; Rondiya, Sachin; Kulkarni, Rupali; Waykar, Ravi; Jadhavar, Ashok; Rokade, Avinash; Funde, Adinath; Mohite, Kakasaheb; Shinde, Manish; Pathan, Habib; Devan, Rupesh; Jadkar, Sandesh

    2017-02-01

    Thin films of CdS have been prepared by chemical spray pyrolysis by spraying precursor solution directly onto soda lime glass (SLG) substrates. Influence of substrate temperature on structural, optical, morphological and electrical properties have been investigated by using various techniques such as low angle X-ray diffraction (XRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), transmission electron microscopy (TEM), UV-visible spectroscopy photoluminescence (PL) spectroscopy etc. Formation of CdS has been confirmed by low angle XRD, Raman spectroscopy and XPS analysis. XRD pattern showed that CdS films are polycrystalline, have hexagonal structure and prefer orientation of crystallites shifts from (101) to (002) with increase in substrate temperature. Raman spectroscopy revealed that exciton-phonon coupling depends on substrate temperature and hence on crystallite size. Optical band gap increased from 2.43 to 2.99 eV when substrate temperature increased from 325 to 475 ^\\circ {{C}}. Transmittance of the film also showed an increasing trend from ˜ 52 % to ˜ 80 % with increase in substrate temperature. Such high band gap and transmittance values of CdS films prepared at 475 ^\\circ {{C}} make it a useful window material in CdS/CdTe and CdS/Cu2S heterojunction solar cells. Project supported by the Department of Science and Technology (DST), Ministry of New and Renewable Energy (MNRE), Government of India, New Delhi.

  19. Morphology in electrochemically grown conducting polymer films

    Science.gov (United States)

    Rubinstein, Israel; Gottesfeld, Shimshon; Sabatani, Eyal

    1992-01-01

    A conducting polymer film with an improved space filling is formed on a metal electrode surface. A self-assembling monolayer is formed directly on the metal surface where the monolayer has a first functional group that binds to the metal surface and a second chemical group that forms a chemical bonding site for molecules forming the conducting polymer. The conducting polymer is then conventioonally deposited by electrochemical deposition. In one example, a conducting film of polyaniline is formed on a gold electrode surface with an intermediate monolayer of p-aminothiophenol.

  20. InSb thin films grown by electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Joginder, E-mail: joginderchauhan82@gmail.com; Rajaram, P., E-mail: joginderchauhan82@gmail.com [School of Studies in Physics, Jiwaji University, Gwalior-474011 (India)

    2014-04-24

    We have grown InSb thin films on Cu substrates using the electrodeposition technique. The electrochemical bath from which the InSb thin films were grown was made up of a mixture of aqueous solutions of 0.05 M InCl{sub 3} and 0.03M SbCl{sub 3}, 0 .20M citric acid and 0.30M sodium citrate. Citric acid and sodium citrate were used as complexing agents to bring the reduction potential of In and Sb closer to maintain binary growth. The electrodeposited films were characterized by structural, morphological and optical studies. X-ray diffraction studies show that the films are polycrystalline InSb having the zinc blende structure. Scanning electron microscopy (SEM) studies reveal that the surface of the films is uniformly covered with submicron sized spherical particles. FTIR spectra of InSb thin films show a sharp absorption peak at wave number 1022 cm{sup −1} corresponding to the band gap. Hot probe analysis shows that the InSb thin films have p type conductivity.

  1. S-Rich CdS1−yTey Thin Films Produced by the Spray Pyrolysis Technique

    Directory of Open Access Journals (Sweden)

    Shadia J. Ikhmayies

    2016-03-01

    Full Text Available Understanding the properties of CdSTe ternary alloys is important because they always form at the interface between the CdS window layer and CdTe absorber layer in CdS/CdTe solar cells due to the intermixing. This interdiffusion is necessary because it improves the device performance. Experimental work has been devoted to studying Te rich p-type CdSxTe1−x alloys, but there is a lack of studies on S-rich n-type CdS1−yTey solid solutions. In this work, a review of the structure, morphology, and optical properties of the S-rich n-type CdS1−yTey thin films produced by the spray pyrolysis technique on glass substrates is presented.

  2. Effect of chlorine doping on the structural, morphological, optical and electrical properties of spray deposited CdS thin films

    Directory of Open Access Journals (Sweden)

    T. Sivaraman

    2015-10-01

    Full Text Available CdS and chlorine doped CdS (CdS:Cl thin films with different Cl-doping levels (0, 2, 4, 6 and 8 at% have been deposited on glass substrates by a spray pyrolysis technique using a perfume atomizer. The effect of Cl doping on the structural, morphological, optical and electrical properties of the films was investigated. XRD patterns revealed that all the films exhibit hexagonal crystal structure with a preferential orientation along the (0 0 2 plane irrespective of the Cl doping level. The particle size value decreases from 22.03 nm to 18.12 nm with increase in Cl concentration. Optical band gap is blue-shifted from 2.48 eV to 2.73 eV with increase in Cl doping concentration. All the films have resistivity in the order of 104 Ω cm. The obtained results confirm that chlorine as an anionic dopant material can enhance the physical properties of CdS thin films to a large extent.

  3. Thermally grown thin nitride films as a gate dielectric

    CERN Document Server

    Shin, H C; Hwang, T K; Lee, K R

    1998-01-01

    High-quality very thin films ( <=6 nm) of silicon nitride were thermally grown in ammonia atmosphere with an IR (Infrared) gold image furnace. As-grown nitride film was analyzed using AES(Auger Emission Spectroscopy). Using MIS (Metal-Insulator-Semiconductor) devices, the growth rate was calculated using CV (Capacitance-Voltage) measurements and various electrical characteristics were obtained using CV, IV (Current-Voltage), trapping, time-dependent breakdown, high-field stress, constant current injection stress and dielectric breakdown techniques. These characteristics showed that very thin thermal silicon nitride films can be used as gate dielectrics for future highly scaled-down ULSI (Ultra Large Scale Integrated) devices, especially for EEPROM (Electrically Erasable and Programmable ROM)'s.

  4. An optimized multilayer structure of CdS layer for CdTe solar cells application

    Energy Technology Data Exchange (ETDEWEB)

    Han Junfeng, E-mail: pkuhjf@gmail.com [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Road Yiheyuan 5, Beijing 100871 (China); Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany); Liao Cheng, E-mail: Cliao@pku.edu.cn [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Road Yiheyuan 5, Beijing 100871 (China); Jiang Tao [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Road Yiheyuan 5, Beijing 100871 (China); Spanheimer, C.; Haindl, G.; Fu, Ganhua; Krishnakumar, V. [Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany); Zhao Kui [State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Road Yiheyuan 5, Beijing 100871 (China); Klein, A.; Jaegermann, W. [Institute of Materials Science, Darmstadt University of Technology, Petersenstr. 23, 64287 Darmstadt (Germany)

    2011-04-28

    Research highlights: > Two different methods to prepare CdS films for CdTe solar cells. > A new multilayer structure of window layer for the CdTe solar cell. > Thinner CdS window layer for the solar cell than the standard CdS layer. > Higher performance of solar cells based on the new multilayer structure. - Abstract: CdS layers grown by 'dry' (close space sublimation) and 'wet' (chemical bath deposition) methods are deposited and analyzed. CdS prepared with close space sublimation (CSS) has better crystal quality, electrical and optical properties than that prepared with chemical bath deposition (CBD). The performance of CdTe solar cell based on the CSS CdS layer has higher efficiency than that based on CBD CdS layer. However, the CSS CdS suffers from the pinholes. And consequently it is necessary to prepare a 150 nm thin film for CdTe/CdS solar cell. To improve the performance of CdS/CdTe solar cells, a thin multilayer structure of CdS layer ({approx}80 nm) is applied, which is composed of a bottom layer (CSS CdS) and a top layer (CBD CdS). That bi-layer film can allow more photons to pass through it and significantly improve the short circuit current of the CdS/CdTe solar cells.

  5. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom)

    2015-05-01

    Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films.

  6. On the yellow-band emission in CdS films

    Energy Technology Data Exchange (ETDEWEB)

    Lozada-Morales, R. [Departamento de Optoelectronica, FCFM-BUAP, Puebla (Mexico); Zelaya-Angel, O. [Dept. de Fisica, CINVESTAV-IPN, Mexico (Mexico); Torres-Delgado, G. [Lab. de Investigacion en Materiales, CINVESTAV-IPN, Queretaro (Mexico)

    2001-07-01

    CdS polycrystalline thin films were prepared by the chemical bath deposition (CBD) method on glass substrates. X-ray diffraction (XRD) studies show that the films grow in the cubic zinc-blende crystalline phase. Upon thermal annealing (TA) in Ar+S{sub 2} flux at normal pressure in the temperature range 240-510 C, the evolution of the transformation into the hexagonal wurtzite phase is observed. This hexagonal crystalline structure is the stable phase. From XRD diagrams the phase transition can be appreciated to occur upon TA at approximately 300 C. Photoluminescence (PL) data prove that the green-emission band is present for well-defined phases - cubic or hexagonal ones. A second band located at 2.2 eV appears for samples near the transition region. This band at 2.2 eV, called the yellow band, has already been reported to be associated with interstitial Cd atoms. A model for this yellow-band-mechanism formation, arising during the phase transformation, has been proposed based on Frenkel-pair creation. (orig.)

  7. Synthesis of CdS nanocrystals in polymeric films studied by in-situ GID and GISAXS

    KAUST Repository

    Di Luccio, Tiziana

    2015-07-07

    In this work, we describe the synthesis of CdS nanocrystals in thin polymeric films by in-situ Grazing Incidence Diffraction (GID) and Grazing Incidence Small Angle Scattering (GISAXS). The 2D GISAXS patterns indicate how the precursor structure is altered as the temperature is varied from 25°C to 300°C. At 150°C, the CdS nanocrystals start to arrange themselves in a hexagonal lattice with a lattice parameter of 27 A. The diffraction intensity from the hexagonal lattice reaches a maximum at 170"C and decreases steadily upon further heating above 220°C indicating loss of symmetry. Correspondingly, the GID scans at 170°C show strong crystalline peaks from cubic CdS nanocrystals that are about 2 nm size. The results indicate that a temperature of 170°C is sufficient to synthesize CdS nanocrystals without degradation of the polymer matrix (Topas) in thin films (about 30nm). © 2015 Materials Research Society.

  8. Chemical bath deposition of CdS thin films: An approach to the chemical mechanism through study of the film microstructure

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Many papers have been published lately on chemical bath deposition of CdS (CBD-CdS) thin films and related materials due to the promising results obtained using CBD-CdS for the fabrication of thin-film solar cells. In spite of this little of the research proposes a realistic chemical mechanism for the deposition process based on the determination of kinetic parameters. In this paper the authors present an exhaustive study of the CBD-CdS kinetic from which they propose a new chemical mechanism which agrees with the kinetic parameters determined supported by heterogeneous catalysis concepts. Simultaneously, the dependence of the deposited film structure on the kinetic variables is studied and the results obtained corroborate the proposed mechanism. These studies have allowed the authors to establish a standard set of conditions for the fabrication of homogeneous and continuous very thin CdS films.

  9. Epitaxial yttrium iron garnet films grown by pulsed laser deposition

    Science.gov (United States)

    Dorsey, P. C.; Bushnell, S. E.; Seed, R. G.; Vittoria, C.

    1993-07-01

    Epitaxial Y3Fe5O12 (YIG) films have been grown by the pulsed laser deposition (PLD) technique on (111) gadolinium gallium garnet substrates. The effect of substrate temperature and oxygen partial pressure on the structure, composition, and magnetic properties of the films was investigated and compared to liquid phase epitaxy YIG films. The results demonstrated that epitaxial YIG films could be prepared under a wide range of deposition conditions, but narrow linewidth (ΔH≂1 Oe) films were producible only at low oxygen partial pressures (O2temperatures (Ts≳800 °C). Since the linewidth of single-crystal YIG is dominated by surface and volume defects and/or impurities, the narrow linewidth indicated that PLD is a viable technique for producing high-quality ferrite films for microwave device applications. In addition, under all deposition conditions (50-1000 mTorr and 700-850 °C) there is a uniaxial axis perpendicular to the film plane. However, at low oxygen pressure the uniaxial anisotropy energy constant Ku is negative while at high oxygen pressure Ku is positive.

  10. Effect of indium doping level on certain physical properties of CdS films deposited using an improved SILAR technique

    Energy Technology Data Exchange (ETDEWEB)

    Ravichandran, K., E-mail: kkr1365@yahoo.com [P.G. and Research Department of Physics, AVVM Sri Pushpam College (Autonomous), Poondi, Thanjavur-613 503, Tamil Nadu (India); Senthamilselvi, V. [P.G. and Research Department of Physics, AVVM Sri Pushpam College (Autonomous), Poondi, Thanjavur-613 503, Tamil Nadu (India); Department of Physics, Kunthavai Naachiyaar Government College for Women (Autonomous), Thanjavur-613 007, Tamil Nadu (India)

    2013-04-01

    The influence of indium (In) doping levels (0, 2, …, 8 at.%) on certain physical properties of cadmium sulphide (CdS) thin films deposited using an improved successive ionic layer adsorption and reaction (ISILAR) method has been studied. In this improved SILAR technique, a fresh anionic solution was introduced after a particular number of dipping cycles in order to achieve good stoichiometry. All the deposited films exhibited cubic phase with (1 1 1) plane as preferential orientation. The calculated crystallite size values are found to be decreased from 54.80 nm to 23.65 nm with the increase in In doping level. The optical study confirmed the good transparency (80%) of the film. A most compact and pinhole free smooth surface was observed for the CdS films with 8 at.% of In doping level. The perceived photoluminescence (PL) bands endorsed the lesser defect crystalline nature of the obtained CdS:In films. The chemical composition analysis (EDAX) showed the near stoichiometric nature of this ISILAR deposited CdS:In films.

  11. Influence of wide band gap oxide substrates on the photoelectrochemical properties and structural disorder of CdS nanoparticles grown by the successive ionic layer adsorption and reaction (SILAR method

    Directory of Open Access Journals (Sweden)

    Mikalai V. Malashchonak

    2015-11-01

    Full Text Available The photoelectrochemical properties of nanoheterostructures based on the wide band gap oxide substrates (ZnO, TiO2, In2O3 and CdS nanoparticles deposited by the successive ionic layer adsorption and reaction (SILAR method have been studied as a function of the CdS deposition cycle number (N. The incident photon-to-current conversion efficiency (IPCE passes through a maximum with the increase of N, which is ascribed to the competition between the increase in optical absorption and photocarrier recombination. The maximal IPCE values for the In2O3/CdS and ZnO/CdS heterostructures are attained at N ≈ 20, whereas for TiO2/CdS, the appropriate N value is an order of magnitude higher. The photocurrent and Raman spectroscopy studies of CdS nanoparticles revealed the occurrence of the quantum confinement effect, demonstrating the most rapid weakening with the increase of N in ZnO/CdS heterostructures. The structural disorder of CdS nanoparticles was characterized by the Urbach energy (EU, spectral width of the CdS longitudinal optical (LO phonon band and the relative intensity of the surface optical (SO phonon band in the Raman spectra. Maximal values of EU (100–120 meV correspond to СdS nanoparticles on a In2O3 surface, correlating with the fact that the CdS LO band spectral width and intensity ratio for the CdS SO and LO bands are maximal for In2O3/CdS films. A notable variation in the degree of disorder of CdS nanoparticles is observed only in the initial stages of CdS growth (several tens of deposition cycles, indicating the preservation of the nanocrystalline state of CdS over a wide range of SILAR cycles.

  12. Influence of wide band gap oxide substrates on the photoelectrochemical properties and structural disorder of CdS nanoparticles grown by the successive ionic layer adsorption and reaction (SILAR) method.

    Science.gov (United States)

    Malashchonak, Mikalai V; Mazanik, Alexander V; Korolik, Olga V; Streltsov, Еugene А; Kulak, Anatoly I

    2015-01-01

    The photoelectrochemical properties of nanoheterostructures based on the wide band gap oxide substrates (ZnO, TiO2, In2O3) and CdS nanoparticles deposited by the successive ionic layer adsorption and reaction (SILAR) method have been studied as a function of the CdS deposition cycle number (N). The incident photon-to-current conversion efficiency (IPCE) passes through a maximum with the increase of N, which is ascribed to the competition between the increase in optical absorption and photocarrier recombination. The maximal IPCE values for the In2O3/CdS and ZnO/CdS heterostructures are attained at N ≈ 20, whereas for TiO2/CdS, the appropriate N value is an order of magnitude higher. The photocurrent and Raman spectroscopy studies of CdS nanoparticles revealed the occurrence of the quantum confinement effect, demonstrating the most rapid weakening with the increase of N in ZnO/CdS heterostructures. The structural disorder of CdS nanoparticles was characterized by the Urbach energy (E U), spectral width of the CdS longitudinal optical (LO) phonon band and the relative intensity of the surface optical (SO) phonon band in the Raman spectra. Maximal values of E U (100-120 meV) correspond to СdS nanoparticles on a In2O3 surface, correlating with the fact that the CdS LO band spectral width and intensity ratio for the CdS SO and LO bands are maximal for In2O3/CdS films. A notable variation in the degree of disorder of CdS nanoparticles is observed only in the initial stages of CdS growth (several tens of deposition cycles), indicating the preservation of the nanocrystalline state of CdS over a wide range of SILAR cycles.

  13. Photoelectrochemical and Raman characterization of In2O3 mesoporous films sensitized by CdS nanoparticles

    Directory of Open Access Journals (Sweden)

    Mikalai V. Malashchonak

    2013-04-01

    Full Text Available The method of successive ion layer adsorption and reaction was applied for the deposition of CdS nanoparticles onto a mesoporous In2O3 substrate. The filling of the nanopores in In2O3 films with CdS particles mainly occurs during the first 30 cycles of the SILAR deposition. The surface modification of In2O3 with CdS nanoparticles leads to the spectral sensitization of photoelectrochemical processes that manifests itself in a red shift of the long-wavelength edge in the photocurrent spectrum by 100–150 nm. Quantum-confinement effects lead to an increase of the bandgap from 2.49 to 2.68 eV when decreasing the number of SILAR cycles from 30 to 10. The spectral shift and the widening of the Raman line belonging to CdS evidences the lattice stress on the CdS/In2O3 interfaces and confirms the formation of a close contact between the nanoparticles.

  14. Structural and Photoelectrochemical Properties of Cu-Doped CdS Thin Films Prepared by Ultrasonic Spray Pyrolysis

    Directory of Open Access Journals (Sweden)

    Rui Xie

    2013-01-01

    Full Text Available Cu-doped CdS thin films of variable doping levels have been deposited on indium tin oxide-coated glass substrate by simple and cost-effective ultrasonic spray pyrolysis. The influences of doping concentration and annealing treatment on the structure and photoelectrochemical properties of the films were investigated. The deposited films were characterized by XRD, SEM, and UV-Vis spectra. Moreover, the films were investigated by electrochemical and photoelectrochemical measurements with regard to splitting water for solar energy conversion. The results showed that the Cu impurity can cause a structural change and red shift of absorption edge. It was found that the photocurrent can be improved by the Cu-doping process for the unannealed films under the weak illumination. The unannealed 5 at.% Cu-doped sample obtained the maximum IPCE, which achieved about 45% at 0.3 V versus SCE potential under 420 nm wavelength photoirradiation. In addition, the p-type CdS was formed with a doping of 4 at.%~10 at.% Cu after 450°C 2 h annealed in vacuum.

  15. CdS thin films obtained by thermal treatment of cadmium(II) complex precursor deposited by MAPLE technique

    Energy Technology Data Exchange (ETDEWEB)

    Rotaru, Andrei [INFLPR - National Institute for Laser, Plasma and Radiation Physics, PPAM - Lasers Department, 409 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania); Mietlarek-Kropidlowska, Anna [Gdansk University of Technology, Chemistry Faculty, 11/12 G. Narutowicza Str., PL-90-233 Gdansk (Poland); Constantinescu, Catalin, E-mail: catalin.constantinescu@inflpr.ro [INFLPR - National Institute for Laser, Plasma and Radiation Physics, PPAM - Lasers Department, 409 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania); Scarisoreanu, Nicu; Dumitru, Marius [INFLPR - National Institute for Laser, Plasma and Radiation Physics, PPAM - Lasers Department, 409 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania); Strankowski, Michal [Gdansk University of Technology, Chemistry Faculty, 11/12 G. Narutowicza Str., PL-90-233 Gdansk (Poland); Rotaru, Petre [University of Craiova, Faculty of Physics, 13 A.I. Cuza St., Craiova RO-200585, Dolj (Romania); Ion, Valentin [INFLPR - National Institute for Laser, Plasma and Radiation Physics, PPAM - Lasers Department, 409 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania); Vasiliu, Cristina [INOE 2000 - National Institute for Optoelectronics, 1 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania); Becker, Barbara [Gdansk University of Technology, Chemistry Faculty, 11/12 G. Narutowicza Str., PL-90-233 Gdansk (Poland); Dinescu, Maria [INFLPR - National Institute for Laser, Plasma and Radiation Physics, PPAM - Lasers Department, 409 Atomistilor Bvd., Magurele RO-077125, Bucharest (Romania)

    2009-05-15

    Thin films of [Cd{l_brace}SSi(O-Bu{sup t}){sub 3}{r_brace}(S{sub 2}CNEt{sub 2})]{sub 2}, precursor for semiconducting CdS layers, were deposited on silicon substrates by Matrix-Assisted Pulsed Laser Evaporation (MAPLE) technique. Structural analysis of the obtained films by Fourier transform infrared spectroscopy (FTIR) confirmed the viability of the procedure. After the deposition of the coordination complex, the layers are manufactured by appropriate thermal treatment of the system (thin film and substrate), according to the thermal analysis of the compound. Surface morphology of the thin films was investigated by atomic force microscopy (AFM) and spectroscopic-ellipsometry (SE) measurements.

  16. Cowrie-shell architectures: Low temperature growth of Ni doped CdS film

    Energy Technology Data Exchange (ETDEWEB)

    Thool, Gautam Sheel; Sraveen, K. [Inorganic and Physical Chemistry Division, CSIR-Indian Institute of Chemical Technology, Uppal Road, Tarnaka, Hyderabad 500007 (India); Singh, Ajaya Kumar [Department of Chemistry, Govt. VYT PG. Autonomous College, Durg 491001, Chhattisgarh (India); Pal, Ujjwal [Central Mechanical Engineering Research Institute, M. G. Avenue, Durgapur 713209 (India); Singh, Surya Prakash, E-mail: spsingh@iict.res.in [Inorganic and Physical Chemistry Division, CSIR-Indian Institute of Chemical Technology, Uppal Road, Tarnaka, Hyderabad 500007 (India)

    2015-11-15

    In this work, we report the synthesis of Ni doped CdS cowrie-shell architectures and submicron balls like structures via low temperature chemical bath deposition method. The as-synthesized materials were systematically characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDAX), Raman spectroscopy and FTIR spectra. XRD results revealed the existence of cubic phase of CdS based material. SEM pictures depicted the growth of well define morphologies i.e. cowries-shell and submicron balls. Deposition time and dopant played significant role in the growth of CdS based different architectures. The EDAX spectra confirmed the presence of Ni into the CdS lattice. Surface structure of synthesized material was derived by FTIR analysis. - Highlights: • Ni doped CdS cowrie-shell like architectures were synthesized using low temperature aqueous solution method. • We demonstrated the deposition time and dopant played significant role in the growth of CdS based different architectures. • The formation of Ni doped CdS submicron balls has taken place by simple over growth on cowrie-shell particles. • FTIR spectra showed that the surface Cd{sup 2+} ions probably coordinated to triethanol amine molecules.

  17. Characterization of CuInSe{sub 2}/CdS thin-film solar cells prepared using CBD

    Energy Technology Data Exchange (ETDEWEB)

    Vidyadharan Pillai, P.K.; Vijayakumar, K.P. [Department of Physics, Cochin University of Science and Technology, Kochi, Kerala (India)

    1997-12-19

    CuInSe{sub 2}/CdS thin-film heterojunction solar cells were fabricated entirely by chemical bath deposition technique. The illuminated J-V characteristics of the devices prepared with different thicknesses of CdS and CuInSe{sub 2} were studied. The typical solar cell parameters obtained for the best cell are: V{sub oc}=365 mV, J{sub sc}=12 mA/cm{sup 2}, FF=61%, and {eta}=3.1% under an illumination of 85 mW/cm{sup 2} on a cell of active area 0.1 cm{sup 2}. The J-V and C-V characteristics under dark condition and the spectral response were also studied for the best cell. The diode quality factor obtained is 1.7

  18. Investigations on microstructural and optical properties of CdS films fabricated by a low-cost, simplified spray technique using perfume atomizer for solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Ravichandran, K.; Philominathan, P. [PG and Research Department of Physics, AVVM, Sri Pushpam College, Poondi, Thanjavur District, Tamil Nadu (India)

    2008-11-15

    Good quality CdS films were fabricated by employing a simplified spray pyrolysis technique using perfume atomizer. CdS films have been deposited from aqueous solutions of sulphur and cadmium, keeping the molar concentrations of S:Cd = 0.01:0.01, 0.02:0.02, 0.04:0.04 and 0.06:0.06 in the starting solutions. The structural studies reveal that the S:Cd concentration has a strong influence on the microstructural characteristics of the sprayed CdS films. It was found that there is a transition in the preferred orientation from (0 0 2) plane to (1 0 1) plane when S:Cd molar concentration increases. The SEM images depict that the films are uniform and homogeneous. All the films have high optical transmittance (>80%) in the visible range. The optical band gap values are found to be in the range of 2.46-2.52 eV. CdS films fabricated by this simple and economic spray technique without using any carrier gas are found to be good in structural and optical properties which are desirable for photovoltaic applications. Hence, this simplified version of spray technique can be considered as an economic alternative to conventional spray pyrolysis (using carrier gas), for the mass production of low-cost, large area CdS coatings for solar cell applications. (author)

  19. Band-gap and sub-band-gap photoelectrochemical processes at nanocrystalline CdS grown on ZnO by successive ionic layer adsorption and reaction method

    Energy Technology Data Exchange (ETDEWEB)

    Malashchonak, M.V., E-mail: che.malasche@gmail.com [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Streltsov, E.A., E-mail: streltea@bsu.by [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Mazanik, A.V. [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Kulak, A.I., E-mail: kulak@igic.bas-net.by [Institute of General and Inorganic Chemistry, National Academy of Sciences of Belarus, Surganova str., 9/1, Minsk 220072 (Belarus); Poznyak, S.K. [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus); Stroyuk, O.L., E-mail: stroyuk@inphyschem-nas.kiev.ua [L.V. Pysarzhevsky Institute of Physical Chemistry of National Academy of Sciences of Ukraine, 31 prosp. Nauky, 03028 Kyiv (Ukraine); Kuchmiy, S.Ya. [L.V. Pysarzhevsky Institute of Physical Chemistry of National Academy of Sciences of Ukraine, 31 prosp. Nauky, 03028 Kyiv (Ukraine); Gaiduk, P.I. [Belarusian State University, Nezalezhnastsi Av. 4, Minsk 220030 (Belarus)

    2015-08-31

    Cadmium sulfide nanoparticle (NP) deposition by the successive ionic layer adsorption and reaction (SILAR) method on the surface of mesoporous ZnO micro-platelets with a large specific surface area (110 ± 10 m{sup 2}g{sup −1}) results in the formation of ZnO/CdS heterostructures exhibiting a high incident photon-to-current conversion efficiency (Y) not only within the region of CdS fundamental absorption (Y{sub max} = 90%; 0.1 M Na{sub 2}S + 0.1 M Na{sub 2}SO{sub 3}), but also in the sub-band-gap (SBG) range (Y{sub max} = 25%). The onset potentials of SBG photoelectrochemical processes are more positive than the band-gap (BG) onset potential by up to 100 mV. A maximum incident photon-to-current conversion efficiency value for SBG processes is observed at larger amount of deposited CdS in comparison with the case of BG ones. The Urbach energy (E{sub U}) of CdS NPs determined from the photocurrent spectra reaches a maximal value on an early deposition stage (E{sub U} = 93 mV at SILAR cycle number N = 5), then lowers somewhat (E{sub U} = 73 mV at N = 10) and remains steady in the range of N from 20 to 300 (E{sub U} = 67 ± 1 mV). High efficiency of the photoelectrochemical SBG processes are interpreted in terms of light scattering in the ZnO/CdS heterostructures. - Highlights: • ZnO/CdS films demonstrate high quantum efficiency (25%) for sub-band-gap transitions. • Onset photocurrent potentials for sub-band-gap processes differ than those for band-gap ones. • Sub-band-gap transitions are caused by band-tail states in CdS nanoparticles.

  20. Size-dependent photodegradation of CdS particles deposited onto TiO{sub 2} mesoporous films by SILAR method

    Energy Technology Data Exchange (ETDEWEB)

    Ahmed, Rasin; Will, Geoffrey; Bell, John; Wang Hongxia, E-mail: hx.wang@qut.edu.au [Queensland University of Technology, School of Chemistry, Physics and Mechanical Engineering (Australia)

    2012-09-15

    The particle size, size distribution and photostability of CdS nanoparticles incorporated onto mesoporous TiO{sub 2} films by a successive ionic layer adsorption and reaction (SILAR) method were investigated by Raman spectroscopy, UV-Visible spectroscopy, transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). High-resolution TEM indicated that the synthesized CdS particles were hexagonal phase and the particle sizes were less than 5 nm for up to nine SILAR deposition cycles. Quantum size effect was found with the CdS-sensitized TiO{sub 2} films prepared with up to nine SILAR cycles. The band gap of CdS nanoparticles decreased from 2.65 to 2.37 eV with the increase of the SILAR cycles from 1 to 11. The investigation of the stability of the CdS/TiO{sub 2} films in air under illumination (440.6 {mu}W/cm{sup 2}) showed that the photodegradation rate was up to 85 % per day for the sample prepared with three SILAR cycles. XPS analysis indicated that the photodegradation was due to the oxidation of CdS, leading to the transformation from sulphide to sulphate (CdSO{sub 4}). Furthermore, the degradation rate was strongly dependent upon the particle size of CdS. Smaller particles showed faster degradation rate. The size-dependent photo-induced oxidization was rationalized with the variation of size-dependent distribution of surface atoms of CdS particles. Molecular dynamics-based theoretical calculation has indicated that the surface sulphide anion of a large CdS particle such as CdS made with 11 cycles (CdS Multiplication-Sign 11, average particle size = 5.6 nm) accounts for 9.6 % of the material whereas this value is increased to 19.2 % for (CdS Multiplication-Sign 3)-based smaller particles (average particle size = 2.7 nm). The photostability of CdS nanoparticles was significantly enhanced when coated with ZnS particles deposited with four SILAR cycles. The growth mechanism of ZnS upon CdS nanoparticles was discussed.

  1. Growth and Characterization of CdS Polycrystalline Films by Electron Beam Evaporation%电子束蒸发制备CdS多晶薄膜及性质研究

    Institute of Scientific and Technical Information of China (English)

    杨定宇; 郑家贵; 朱兴华; 魏昭荣; 杨军; 高秀英

    2009-01-01

    The CdS thin films were grown by electron beam evaporation on glass substrates elevated at different temperatures.The impacts of the film growth conditions on its properties were studied.The microstructures and properties of the CdS film were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM)and conventional optical probes.The results show that the substrate temperature significantly affects the films growth and its properties.For instance,as substrate temperature rises up,the hexagonal grains with 〈002〉preferential orientation get bigger;the〈103〉,〈004〉and〈105〉orientations in the increasingly compact films gradually show up;and the wide absorption edge of the polycrystalline CdS films become steeper.The averaged transmittance of visible light after 550nm in CdS films was found to be 70%,good enough for the window material of CdTe solar cells.%采用电子束蒸发工艺在普通玻璃衬底上制备了硫化镉(CdS)多晶薄膜,研究了不同衬底温度对薄膜结构、表面形貌及光透过率的影响.测试结果显示:(1)不同衬底温度下沉积的CdS薄膜均呈现了〈002〉晶向的高度优势生长,属于六方相结构.随着衬底温度的升高,还逐渐出现了〈103〉、〈004〉、〈105〉等六方晶向;(2)CdS多晶薄膜表面连续,致密性好,且晶粒大小随着衬底温度的升高而增大;(3)低温下制备CdS薄膜吸收谱有较宽的吸收边,随着衬底温度的升高,吸收曲线趋于陡直.制备样品在550nm波段后的平均透过率都超过70%,符合作为CdTe太阳电池的窗口层.

  2. Improving the optical and crystalline properties on CdS thin films growth on small and large area by using CBD technique

    Energy Technology Data Exchange (ETDEWEB)

    Albor A, M. L.; Flores M, J. M.; Hernandez V, C.; Contreras P, G.; Mejia G, C.; Rueda M, G. [IPN, Escuela Superior de Fisica y Matematicas, Departamento de Fisica, Unidad Profesional Adolfo Lopez Mateos, Zacatenco, 07738 Ciudad de Mexico (Mexico); Gonzalez T, M. A. [IPN, Escuela Superior de Computo, Departamento de Formacion Basica, Unidad Profesional Adolfo Lopez Mateos, 07738 Ciudad de Mexico (Mexico)

    2016-11-01

    CdS polycrystalline thin films have been used as window layer in solar cells; the optical and crystalline quality of the CdS-partner plays and important role in the photovoltaic device performance. CdS thin films were deposited by using Chemical Bath Deposition. The SnO{sub 2}:F substrates used were chemically treated with HCl (0.1 M) and others were thermally annealed in different atmospheres (Ar and O{sub 2}). The physical properties of CdS thin films were influenced by the HCl treatment, position, size and the substrates movement inside the reaction beaker. The CdS samples were deposited in areas of 4 cm{sup 2}, 50 cm{sup 2} and 100 cm{sup 2}. Finally CdS thin films with thickness of 35-300 nm with good optical and crystalline quality on a uniform morphology were obtained. Transmittance values were obtained for all samples about 85-90 % with an average of gap energy of 2.5 eV. The structural characteristics of the samples were determined by the X-ray diffraction patterns, by means of a D-500 Siemens X-ray system. (Author)

  3. Rf sputtering of CdTE and CdS for thin film PV

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.D.; Tabory, C.N.; Shao, M.; Fischer, A.; Feng, Z.; Bohn, R.G. (Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States))

    1994-06-30

    In late 1992 we demonstrated the first rf sputtered CdS/CdTe photovoltaic cell with efficiency exceeding 10%. In this cell both CdS and CdTe layers were deposited by rf sputtering. In this paper we report preliminary measurements of (1) optical emission spectroscopy of the rf plasma, (2) the width of the phonon Raman line as a function of deposition temperature for CdS, and (3) studies of oxygen doping during pulsed laser deposition of CdTe.

  4. Anisotropic magnetothermopower in ferromagnetic thin films grown on macroscopic substrates

    Energy Technology Data Exchange (ETDEWEB)

    Jayathilaka, P.B. [Department of Physical Sciences, Faculty of Applied Sciences, Rajarata University of Sri Lanka, Mihintale (Sri Lanka); Belyea, D.D. [Department of Physics, University of South Florida, 4202 East Fowler Avenue, Tampa, FL 33620 (United States); Fawcett, T.J. [College of Engineering, University of South Florida, 4202 East Fowler Avenue, Tampa, FL 33620 (United States); Miller, Casey W. [School of Chemistry and Materials Science, Rochester Institute of Technology, 85 Lomb Memorial Drive, Rochester, NY 14623 (United States)

    2015-05-15

    We report observing the anisotropic magnetothermopower in a variety of ferromagnetic thin films grown on macroscopic substrates. These measurements were enabled by eliminating spurious signals related to the Anomalous Nernst Effect by butt-mounting the sample to the heat source and sink, and appropriate positioning of electrical contacts to avoid unwanted thermal gradients. This protocol enabled detailed measurements of the magnetothermopower in the transverse and longitudinal configurations. This may enable Spin Seebeck Effect studies in the in-plane geometry. - Highlights: • Unintentional thermal gradients along surface normal mitigated via butt-mounting. • Longitudinal/transverse magnetothermopower measured on many systems. • Anomalous Nernst Effect reduced. • Importance of magnetic anisotropy identified with angle-dependent measurements.

  5. Visible light photocatalysis via 3D-ordered macroporous TiO2 films sensitized with CdS quantum dots.

    Science.gov (United States)

    Xie, Hao; Zeng, Tao; Jin, Shaofen; Li, Yuanzhi; Wang, Xuelai; Sui, Xiaotao; Zhao, Xiujian

    2013-02-01

    CdS quantum dots (QDs)-sensitized TiO2 film with three-dimensionally (3D) ordered macropores was synthesized via a two-step method on ITO glass substrate. 3D-ordered macroporous TiO2 film was firstly fabricated on an ITO glass via layer-by-layer deposition and hydrolysis of tetrabutyl titanate using 3D-ordered latex film as organic template, followed by calcination at 450 degrees C for 2 h to remove the template. Then, the CdS QDs were deposited on the 3D-ordered macroporous TiO2 film by successive ionic layer adsorption and reaction technique. The as-prepared CdS-sensitized TiO2 film was characterized with X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, transmission electron microscopy, diffusive reflectance UV-visible absorption spectra, and photoelectrochemical measurements. Its photocatalytic activity was evaluated by the photocatalytic degradation of crystal violet aqueous solution at ambient temperature. It was revealed in our results that the CdS QDs-sensitized 3D-ordered macroporous TiO2 film exhibits enhanced photocatalytic activity for the photodegradation of crystal violet than that of the CdS-free 3D-ordered macroporous TiO2 film and that of CdS QD-sensitized TiO2 film without 3D-ordered macropores under the irradiation of visible light due to the co-existence of 3D-ordered interconnected macropores and the sensitization of CdS QDs.

  6. The Influence of Heat Treatment on the Optical Parameters of Spray-Deposited CdS: In Thin Films

    Science.gov (United States)

    Ikhmayies, Shadia J.

    2017-02-01

    Cadmium sulfide is an important material for solar cells and optoelectronic devices. For the development of these technologies, a comprehensive optical characterization of this material is required. Doping with indium affects the optical parameters of CdS. In this study, indium-doped cadmium sulfide thin films (CdS:In) were produced by the spray pyrolysis technique. The films were annealed in a nitrogen atmosphere, and the influence of annealing on the optical parameters was investigated. Transmittance was measured and used to deduce absorption coefficient, bandgap energy, extinction coefficient, refractive index, real and imaginary parts of the dielectric constant, optical conductivity, and energy loss before and after annealing. Tailing in the bandgap was assumed to follow Urbach tailing, and the effect of annealing on the width of the tail was studied. Dispersion of the refractive index was analyzed using the single oscillator model, and the influence of annealing on the dispersion parameters is discussed.

  7. Structure and Morphology of Phthalocyanine Films Grown in Electrical Fields by Vapor Deposition

    Science.gov (United States)

    Zhu, Shen; Banks, C. E.; Frazier, D. O.; Penn, B.; Abdeldayem, H.; Hicks, R.; Burns, H. D.; Thompson, G. W.

    1999-01-01

    Phthalocyanine (Pc) films have been synthesized by vapor deposition on quartz substrates, some of which were coated with a very thin gold film before depositing Pc films. Electrical fields up to 6200 V/cm between a mech electrode and the substrate are introduced during film growth. These films have been characterized by x-ray diffraction and scanning electron microscopy. The molecular orientations and surface morphology of Pc films were changed under the electrical fields. The surface of these films grown without electrical field shows whisk-like morphology. When films are deposited under an electrical field, a dense film with flat surface is obtained.

  8. Physical properties of Bi doped CdTe thin films grown by CSVT and their influence on the CdS/CdTe solar cells PV-properties

    Energy Technology Data Exchange (ETDEWEB)

    Vigil-Galan, O. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico)]. E-mail: osvaldo@esfm.ipn.mx; Sanchez-Meza, E. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Ruiz, C.M. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain); Sastre-Hernandez, J. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Morales-Acevedo, A. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); CINVESTAV-IPN, Electrical Engineering Department, Av. IPN No2508, C. P. 07360, Mexico, D. F. (Mexico); Cruz-Gandarilla, F. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Aguilar-Hernandez, J. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Saucedo, E. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain); Contreras-Puente, G. [Escuela Superior de Fisica y Matematicas-I.P.N., Edificio de Fisica Avanzada, av. IPN y Juan de Dios Batiz s/n U.P.A.L.M. 07738 Mexico D.F. (Mexico); Bermudez, V. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain)

    2007-05-31

    The physical properties of Bi doped CdTe films, grown on glass substrates by the Closed Space Transport Vapour (CSVT) method, from different Bi doped CdTe powders are presented. The CdTe:Bi films were characterized using Photoluminescence, Hall effect, X-Ray diffraction, SEM and Photoconductivity measurements. Moreover, CdS/CdTe:Bi solar cells were made and their characteristics like short circuit current density (J {sub sc}), open circuit voltage (V {sub OC}), fill factor (FF) and efficiency ({eta}) were determined. These devices were fabricated from Bi doped CdTe layers deposited on CdS with the same growth conditions than those used for the single CdTe:Bi layers. A correlation between the CdS/CdTe:Bi solar cell characteristics and the physical properties of the Bi doped CdTe thin films are presented and discussed.

  9. Self-Organization of CdS Nanoparticles in Polystyrene Film

    Institute of Scientific and Technical Information of China (English)

    梁海春; 向红; 容敏智; 章明秋; 曾汉民; 王树峰; 龚旗煌

    2002-01-01

    Self-organization of nano-CdS particles in polystyrene can be observed by encapsulating the particles with ndodecyl mercaptan owing to a strong electron transfer interaction between the modified CdS nanoparticles and aliphatic carbons in polystyrene. Consequently, ultraviolet/visible absorption edge of the treated nanoCdS/polystyrene composites is further blueshifted in addition to the shift caused by the quantum size effect, and the fluorescence emission peak of the composite becomes redshifted and narrow.

  10. CdS and ZnS quantum dots embedded in hyaluronic acid films

    Energy Technology Data Exchange (ETDEWEB)

    Khachatryan, G.; Khachatryan, K. [Department of Chemistry, Agricultural University, Balicka 122, 30-149 Krakow (Poland); Stobinski, L. [Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 48/52, 01-224 Warsaw (Poland); Faculty of Materials Science and Engineering, Warsaw University of Technology, Woloska 141, 02-507 Warszawa (Poland)], E-mail: lstob@ichf.edu.pl; Tomasik, P.; Fiedorowicz, M. [Department of Chemistry, Agricultural University, Balicka 122, 30-149 Krakow (Poland); Lin, H.M. [Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, ROC (China)

    2009-07-29

    An in situ synthesis of ZnS and CdS quantum dots (QDs) in an aqueous solution of sodium hyaluronate (Hyal) produced foils emitting light on excitation with a UV light. The wavelength of emission was only slightly QDs size and more QDs concentration dependent and reached up to {approx}320 nm in the case of ZnS and {approx}400-450 nm in the case of CdS. Nanoparticles remained as non-agglomerated 10-20 nm nanoclusters. CdS/Hyal and ZnS/Hyal-QDs biocomposites were characterized using photoluminescence (PL), IR spectrometric techniques, and Transmission Electron Microscopy (TEM). The absolute molecular weights, radii of gyration, R{sub g}, and thermodynamic properties of the obtained foils are given. Electric resistivity studies performed for the hyaluronic foil in the 100-1000 V range have revealed that the hyaluronate foil has very weak conducting properties and QDs only insignificantly affect those properties as QDs practically did not interact with the foil. Size exclusion chromatography showed a decrease in the molecular weight of the hyaluronate after generation of QDs in its solution, particularly in the lower molecular fraction of the hyaluronate. The generation of CdS QDs was more destructive for the polysaccharide matrix.

  11. Nanocauliflower like structure of CdS thin film for solar cell photovoltaic applications: Insitu tin doping by chemical bath deposition technique

    CSIR Research Space (South Africa)

    Wilson, KC

    2014-01-01

    Full Text Available We report on surface morphology changes of in situ tin (Sn) doped cadmium sulphide (CdS) thin film nanostructures prepared on a glass substrate using the chemical bath deposition (CBD) technique. Sn-doping in the presence of triethanolammine (TEOA...

  12. Electron Filtering by an Intervening ZnS Thin Film in the Au Nanoparticle-loaded CdS Plasmonic Photocatalyst.

    Science.gov (United States)

    Takayama, Kouichi; Fujiwara, Keigo; Kume, Takahiro; Naya, Shin-Ichi; Tada, Hiroaki

    2016-12-12

    In the gold nanoparticle (Au NP)-loaded CdS film on fluorine-doped tin oxide electrode (Au/CdS/FTO), the localized plasmonic resonance excitation-induced electron injection from Au NP to CdS has been proved by photoelectrochemical measurements. Formation of ZnS thin films between the Au NP and CdS film leads to a drastic increase of the photocurrent under visible-light irradiation ( > 610 nm) in a 0.1 M NaClO4 aqueous electrolyte solution due to the electron filtering effect. The photocurrent strongly depends on the thickness of the ZnS film, and the maximum value is obtained at the thickness of as thin as 2.1 nm. Further, the ZnS overlayer significantly stabilizes the photocurrent of the CdS/FTO electrode in a polysulfide/sulfide electrolyte solution even under the excitation of CdS ( > 430 nm). This work presents important information about the design for the new plasmonic photocatalysts consisting of plasmonic metal NP and chalcogenide semiconductors with high conduction band edge.

  13. Electron Filtering by an Intervening ZnS Thin Film in the Gold Nanoparticle-Loaded CdS Plasmonic Photocatalyst.

    Science.gov (United States)

    Takayama, Kouichi; Fujiwara, Keigo; Kume, Takahiro; Naya, Shin-Ichi; Tada, Hiroaki

    2017-01-05

    In the gold nanoparticle (Au NP)-loaded CdS film on fluorine-doped tin oxide electrode (Au/CdS/FTO), the localized plasmonic resonance excitation-induced electron injection from Au NP to CdS has been proven by photoelectrochemical measurements. Formation of ZnS thin films between the Au NP and CdS film leads to a drastic increase of the photocurrent under visible-light irradiation (λ > 610 nm) in a 0.1 M NaClO4 aqueous electrolyte solution due to the electron filtering effect. The photocurrent strongly depends on the thickness of the ZnS film, and the maximum value is obtained at a thickness as thin as 2.1 nm. Furthermore, the ZnS overlayer significantly stabilizes the photocurrent of the CdS/FTO electrode in a polysulfide/sulfide electrolyte solution even under the excitation of CdS (λ > 430 nm). This work presents important information about the design for new plasmonic photocatalysts consisting of plasmonic metal NPs and chalcogenide semiconductors with high conduction band edge.

  14. Characterization of nanostructured photosensitive (NiS){sub x}(CdS){sub (1-x)} composite thin films grown by successive ionic layer adsorption and reaction (SILAR) route

    Energy Technology Data Exchange (ETDEWEB)

    Ubale, A.U., E-mail: ashokuu@yahoo.com [Nanostructured Thin Film Materials Laboratory, Department of Physics, Govt. Vidarbha Institute of Science and Humanities, Amravati 444604, Maharashtra (India); Bargal, A.N. [Nanostructured Thin Film Materials Laboratory, Department of Physics, Govt. Vidarbha Institute of Science and Humanities, Amravati 444604, Maharashtra (India)

    2011-07-15

    Highlights: {yields} Thin films of (NiS){sub x}(CdS){sub (1-x)} with variable composition (x = 1 to 0) were deposited onto glass substrates by the successive ionic layer adsorption and reaction (SILAR) method. {yields} The structural, surface morphological and electrical characterizations of the as deposited and annealed films were studied. {yields} The bandgap and activation energy of annealed (NiS){sub x}(CdS){sub (1-x)} film decrease with improvement in photosensitive nature. -- Abstract: Recently ternary semiconductor nanostructured composite materials have attracted the interest of researchers because of their photovoltaic applications. Thin films of (NiS){sub x}(CdS){sub (1-x)} with variable composition (x = 1-0) had been deposited onto glass substrates by the successive ionic layer adsorption and reaction (SILAR) method. As grown and annealed films were characterised by X-ray diffraction, scanning electron microscopy and EDAX to investigate structural and morphological properties. The (NiS){sub x}(CdS){sub (1-x)} films were polycrystalline in nature having mixed phase of rhombohedral and hexagonal crystal structure due to NiS and CdS respectively. The optical and electrical properties of (NiS){sub x}(CdS){sub (1-x)} thin films were studied to determine compsition dependent bandgap, activation energy and photconductivity. The bandgap and activation energy of annealed (NiS){sub x}(CdS){sub (1-x)} film decrease with improvement in photosensitive nature.

  15. Ferromagnetism and increased ionicity in epitaxially grown TbMnO3 films

    NARCIS (Netherlands)

    Rubi, D.; de Graaf, C.; Daumont, C. J. M.; Mannix, D.; Broer, R; Noheda, B

    2009-01-01

    Thin films of TbMnO3 have been grown on SrTiO3 substrates. The films grow under compressive strain and are only partially clamped to the substrate. This produces remarkable changes in the magnetic properties and, unlike the bulk material, the films display ferromagnetic interactions below the orderi

  16. Dense CdS thin films on fluorine-doped tin oxide coated glass by high-rate microreactor-assisted solution deposition

    Energy Technology Data Exchange (ETDEWEB)

    Su, Yu-Wei, E-mail: suyuweiwayne@gmail.com [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Ramprasad, Sudhir [Energy Processes and Materials Division, Pacific Northwest National Laboratory, Corvallis, OR 9730 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Han, Seung-Yeol; Wang, Wei [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Ryu, Si-Ok [School of Display and Chemical Engineering, Yeungnam University, 214-1 Dae-dong, Gyeonsan, Gyeongbuk 712-749 (Korea, Republic of); Palo, Daniel R. [Barr Engineering Co., Hibbing, MN 55747 (United States); Paul, Brian K. [School of Mechanical, Industrial and Manufacturing Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States); Chang, Chih-hung [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97330 (United States); Microproducts Breakthrough Institute and Oregon Process Innovation Center, Corvallis, Oregon 97330 (United States)

    2013-04-01

    Continuous microreactor-assisted solution deposition is demonstrated for the deposition of CdS thin films on fluorine-doped tin oxide (FTO) coated glass. The continuous flow system consists of a microscale T-junction micromixer with the co-axial water circulation heat exchanger to control the reacting chemical flux and optimize the heterogeneous surface reaction. Dense, high quality nanocrystallite CdS thin films were deposited at an average rate of 25.2 nm/min, which is significantly higher than the reported growth rate from typical batch chemical bath deposition process. Focused-ion-beam was used for transmission electron microscopy specimen preparation to characterize the interfacial microstructure of CdS and FTO layers. The band gap was determined at 2.44 eV by UV–vis absorption spectroscopy. X-ray photon spectroscopy shows the binding energies of Cd 3d{sub 3/2}, Cd 3d{sub 5/2}, S 2P{sub 3/2} and S 2P{sub 1/2} at 411.7 eV, 404.8 eV, 162.1 eV and 163.4 eV, respectively. - Highlights: ► CdS films deposited using continuous microreactor-assisted solution deposition (MASD) ► Dense nanocrystallite CdS films can be reached at a rate of 25.2 [nm/min]. ► MASD can approach higher film growth rate than conventional chemical bath deposition.

  17. Photoresponse properties of BaSi2 film grown on Si (100) by vacuum evaporation

    Science.gov (United States)

    Thi Trinh, Cham; Nakagawa, Yoshihiko; Hara, Kosuke O.; Takabe, Ryota; Suemasu, Takashi; Usami, Noritaka

    2016-07-01

    We have succeeded in the observation of high photoresponsivity of orthorhombic BaSi2 film grown on crystalline Si by a vacuum evaporation method, raising the prospect of its promising application in high-efficiency thin-film solar cells. Photocurrent was observed at photon energies larger than 1.28 eV, which corresponds to the band gap of evaporated BaSi2 film, indicating that the photoresponsivity originates from the BaSi2 film. The effect of the substrate temperature on the film’s properties was also investigated. The films grown at a substrate temperature larger than 500 °C are single-phase polycrystalline BaSi2 films, while those grown at a substrate temperature of 400 °C is a mixture of phases. We confirmed that undoped evaporated BaSi2 films are an n-type material with high carrier concentration. High carrier lifetime of 4.8 and 2.7 μs can be found for the films grown at 500 °C and 400 °C, respectively. BaSi2 film grown at a substrate temperature of 500 °C, which is crack-free and single-phase, shows the best photoresponsivity. The maximum value of photocurrent was obtained at photon energy of 1.9 eV, corresponding to an external quantum efficiency of 22% under reverse applied voltage of 2 V.

  18. Vapor Phase Sensing Using Metal Nanorod Thin Films Grown by Cryogenic Oblique Angle Deposition

    Directory of Open Access Journals (Sweden)

    Piyush Shah

    2013-01-01

    Full Text Available We demonstrate the chemical sensing capability of silver nanostructured films grown by cryogenic oblique angle deposition (OAD. For comparison, the films are grown side by side at cryogenic (~100 K and at room temperature (~300 K by e-beam evaporation. Based on the observed structural differences, it was hypothesized that the cryogenic OAD silver films should show an increased surface enhanced Raman scattering (SERS sensitivity. COMSOL simulation results are presented to validate this hypothesis. Experimental SERS results of 4-aminobenzenethiol (4-ABT Raman test probe molecules in vapor phase show good agreement with the simulation and indicate promising SERS applications for these nanostructured thin films.

  19. Micro-porous TiO2 thin films grown on surface of Ti substrate

    Institute of Scientific and Technical Information of China (English)

    WU Xiao-hong; QIN Wei; JIANG Zhao-hua; HU Xin-guo; Li Qing-fen

    2004-01-01

    Microporous titanium dioxide thin films have been grown on titanium plates by the micro-plasma oxidation method with different current densities (4, 6, 10 and 14 A/dm2). X-ray diffraction, scanning electronic microscopy and UV-Vis spectrophotometry were used to characterize the films. It is found that the films grown are microporous and consist of crystalline titanium dioxide. The micropore size and the content of anatase and rutile TiO2 phase increase with the applied voltage. The relatively higher degradation efficiency for rhodamine B is obtained in the film produced with a current density of 10 A/dm2.

  20. Structural and optical properties of ZnS thin film grown by pulsed electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Hennayaka, H.M.M.N.; Lee, Ho Seong, E-mail: hs.lee@knu.ac.kr

    2013-12-02

    ZnS thin films were grown on indium–tin-oxide coated glass substrates using pulsed electrodeposition and the effect of the deposition temperature on the structural and optical properties of the ZnS films was investigated. Polycrystalline cubic ZnS films were obtained at all the deposition temperatures. At temperatures below 70 °C, less dense films were obtained and particle agglomeration was visible. On the other hand, at temperatures above 70 °C, more dense films with well-defined grains were obtained. With increasing deposition temperatures, the optical transmittance and bandgap of the ZnS films decreased. These results are attributed to the increase in the thickness of ZnS films and their particle size. The ZnS films grown at 90 °C exhibited the highly (200) preferred orientation and n-type conductivity with a wide bandgap of 3.75 eV. - Highlights: • This study describes the effect of the deposition temperature on the growth of the ZnS thin films. • ZnS thin films were grown using pulsed electrodeposition. • ZnS thin films exhibited the good crystal quality and chemical composition. • ZnS thin films exhibited n-type conductivity with a wide bandgap of 3.75 eV.

  1. Room temperature direct band gap emission characteristics of surfactant mediated grown compressively strained Ge films

    Science.gov (United States)

    Katiyar, Ajit K.; Grimm, Andreas; Bar, R.; Schmidt, Jan; Wietler, Tobias; Joerg Osten, H.; Ray, Samit K.

    2016-10-01

    Compressively strained Ge films have been grown on relaxed Si0.45Ge0.55 virtual substrates using molecular beam epitaxy in the presence of Sb as a surfactant. Structural characterization has shown that films grown in the presence of surfactant exhibit very smooth surfaces with a relatively higher strain value in comparison to those grown without any surfactant. The variation of strain with increasing Ge layer thickness was analyzed using Raman spectroscopy. The strain is found to be reduced with increasing film thickness due to the onset of island nucleation following Stranski-Krastanov growth mechanism. No phonon assisted direct band gap photoluminescence from compressively strained Ge films grown on relaxed Si0.45Ge0.55 has been achieved up to room temperature. Excitation power and temperature dependent photoluminescence have been studied in details to investigate the origin of different emission sub-bands.

  2. Enhanced charge collection and photocatalysis performance of CdS and PbS nanoclusters co-sensitized TiO{sub 2} porous film

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Miao; Xu, Yanyan; Gong, Zezhou; Tao, Jiajia [School of Physics & Material Science, Anhui University, Hefei 230601 (China); Sun, Zhaoqi, E-mail: szq@ahu.edu.cn [School of Physics & Material Science, Anhui University, Hefei 230601 (China); Lv, Jianguo [School of Electronic & Information Engineering, Hefei Normal University, Hefei, 230601 (China); National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China); Chen, Xiaoshuang [National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China); Jiang, Xishun [School of Physics & Material Science, Anhui University, Hefei 230601 (China); School of Mechanical & Electronic Engineering, Chuzhou University, Chuzhou, 239000 (China); He, Gang; Wang, Peihong; Meng, Fanming [School of Physics & Material Science, Anhui University, Hefei 230601 (China)

    2015-11-15

    A novel translucent TiO{sub 2} porous film was prepared through etched method. The CdS, PbS and CdS/PbS nanoclusters were imbedded on TiO{sub 2} porous film by successive ionic layer adsorption and reaction method. Microstructure, morphology, optical and photoelectron-chemical properties of the as-synthesized thin films were investigated systematically. XRD and morphology analysis showed that PbS or CdS nanoclusters have been attached to the TiO{sub 2} porous films. It was found that the energy band gap of TiO{sub 2} porous film decreased from 3.46 to 3.2 eV after sensitized with nanoclusters. The photocurrent density of ITO/TiO{sub 2} photoelectrode increased from 0.017 to 0.28 mA/cm{sup 2} after co-sensitized with CdS and PbS nanoclusters. Besides, the photoelectrode sensitized with two sorts of nanoclusters showed evident higher photocurrent density than which sensitized just one sort of nanoclusters. The photocurrent density of ITO/TiO{sub 2}/PbS and TO/TiO{sub 2}/CdS photoelectrode was 0.11 mA/cm{sup 2} and 0.22 mA/cm{sup 2} respectively. 0.28 mA/cm{sup 2} can be obtained by ITO/TiO{sub 2}/CdS/PbS photoelectrode. The results showed that the optical and photoelectrochemistry properties and phtotcatalysis performance of TiO{sub 2} porous film were greatly improved by co-sensitized with CdS and PbS nanoclusters. - Graphical abstract: When CdS and PbS were brought in the cascade structure, such a Fermi level alignment causes upward and downward shifts of the band edges for PbS and CdS, respectively. Therefore the resulting band edges for the ITO/TiO{sub 2}/CdS/PbS devices are inferred to have a stepwise structure. The elevated conduction band edge of PbS provides a higher driving force for the injection of photogenerated electrons from PbS to CdS as well as the injection of excited holes from CdS to PbS. Such a structure offers efficient separation and transport of the excited electrons and holes. - Highlights: • Ti films were obtained from direct current

  3. Nanostructured and wide bandgap CdS:O thin films grown by reactive RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Islam, M. A.; Rahman, K. S.; Haque, F.; Rashid, M. J.; Akhtaruzzaman, M.; Sopian, K.; Sulaiman, Y. [Solar Energy Research Institute (SERI), National University of Malaysia, 43600 Bangi (Malaysia); Amin, N. [Solar Energy Research Institute (SERI), National University of Malaysia, 43600 Bangi (Malaysia); Department of Electrical, Electronic and System Engineering, Faculty of Engineering and Built Environment, National University of Malaysia, 43600 Bangi (Malaysia)

    2015-05-15

    In this study, CdS:O thin films were prepared from a 99.999% CdS target by reactive sputtering in a Ar:O{sub 2} (99:1) ambient with different RF power at room temperature. The deposited films were studied by means of XRD, SEM, EDX, Hall Effect and UV-Vis spectrometry. The incorporations of O{sub 2} into the films were observed to increase with the decrease of deposition power. The cryatallinity of the films were reduced, whereas the band gaps of the films were increased by the increase of O{sub 2} content on the films. The films were found in nano-structured grains with a compact surface. It has been seen that the highest carrier density is observed in the film with O{sub 2} at.% 21.10, while the values decreased with the further increase or decrease of O{sub 2} content on the films; indicating that specific amount of donor like O{sub 2} atoms substitute to the S atoms can improve the carrier density of the CdS:O thin film.

  4. Plasmon resonance-induced photoluminescence enhancement of CdTe/Cds quantum dots thin films

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Hongyu [Nanjing University of Posts and Telecommunications, Nanjing 210003 (China); National Laboratory of Solid State Microstructure and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China); Xu, Ling, E-mail: xuling@nju.edu.cn [National Laboratory of Solid State Microstructure and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China); Wu, Yangqing; Xu, Jun; Ma, Zhongyuan; Chen, Kunji [National Laboratory of Solid State Microstructure and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China)

    2016-11-30

    Highlights: • CdTe/CdS quantum dots/Au nano-rods nano-composite films were fabricated. • PL intensity of the quantum dots films was enhanced due to Au nanorods. • Internal quantum efficiency increased due to localized surface plasmon resonance. • The lifetimes of quantum dots films decreased after interaction with Au nano-rods. - Abstract: CdTe/CdS quantum dots/Au nano-rods nano-composite films were fabricated on planar Si substrates. The optical properties of all samples were investigated and the corresponding simulations were studied. It was found that the photoluminescence intensity of the CdTe/CdS quantum dots films was enhanced about 9-fold after the incorporation of Au nano-rods, the internal quantum efficiency increased from 24.3% to 35.2% due to the localized surface plasmon resonance. The time-resolved luminescence decay curves showed that the lifetimes of CdTe/CdS quantum dots films decreased to 2.8 ns after interaction with Au nano-rods. The results of finite-difference time-domain simulation indicated that Au nano-rods induced the localization of electric field, which enhanced the PL intensity of quantum dots films in the vicinity of Au nano-rods.

  5. Influence of deposition parameters on the structural and optical properties of CdS thin films obtained by micro-controlled SILAR deposition

    Science.gov (United States)

    Rao, K. Gowrish; Ashith, V. K.

    2015-02-01

    Polycrystalline CdS films were obtained by a micro-controlled SILAR deposition technique, using aqueous solutions of cadmium acetate and thiourea as precursors. The structural and optical properties of the films were found to be influenced by various deposition parameters such as number of immersion cycles, concentration of the precursors and temperature of the solutions. Contrary to the observations made by some researchers, we found that the thickness of the films increased continuously with number of immersion cycles and also with concentration of the precursor solutions. We also found that the films covered the substrates uniformly, without any voids, unlike the films obtained by others. Effect of deposition parameters on thickness, substrate coverage, grain size, chemical composition, optical band gap and other properties of the films is discussed in detail.

  6. Photoluminescence studies of CdS layers for solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Gemain, Frederique; Robin, Ivan-Christophe; Renet, Sebastien; Bernardi, Sergio [Commissariat a l' Energie Atomique et aux Energies Alternatives, CEA-LETI, Minatec Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)

    2012-08-15

    Photoluminescence (PL) measurements were performed on polycrystalline CdS films grown by close space sublimation (CSS) or by chemical bath deposition (CBD) in order to observe the evolution of emission features according to the deposition technique and post-deposition treatments. CdS is naturally n-type because of the presence of sulphur vacancies and in most of the observed samples, a donor-acceptor pair involving the sulfur vacancies could be identified at 1.65 eV. Different complexes emissions could be identified depending on the deposition technique and post-growth treatment. The best efficiencies were measured on CdTe/CdS based solar cells for which the CdS layer presents an excitonic donor bound PL peak as well as an emission corresponding to interstitial cadmium (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  7. Plasmon resonance-induced photoluminescence enhancement of CdTe/Cds quantum dots thin films

    Science.gov (United States)

    Wang, Hongyu; Xu, Ling; Wu, Yangqing; Xu, Jun; Ma, Zhongyuan; Chen, Kunji

    2016-11-01

    CdTe/CdS quantum dots/Au nano-rods nano-composite films were fabricated on planar Si substrates. The optical properties of all samples were investigated and the corresponding simulations were studied. It was found that the photoluminescence intensity of the CdTe/CdS quantum dots films was enhanced about 9-fold after the incorporation of Au nano-rods, the internal quantum efficiency increased from 24.3% to 35.2% due to the localized surface plasmon resonance. The time-resolved luminescence decay curves showed that the lifetimes of CdTe/CdS quantum dots films decreased to 2.8 ns after interaction with Au nano-rods. The results of finite-difference time-domain simulation indicated that Au nano-rods induced the localization of electric field, which enhanced the PL intensity of quantum dots films in the vicinity of Au nano-rods.

  8. X-ray study of chromium oxide films epitaxially grown on MgO

    NARCIS (Netherlands)

    Du, XS; Hak, S; Rogojami, OC; Hibma, T

    2004-01-01

    Chromium oxide films grown by molecular beam epitaxy on MgO (001) substrates were characterized by x-ray diffraction (XRD) and x-ray reflectivity (XRR) measurements. The absence of random oriented peaks in the theta-2theta spectra indicated that the thin films were a single phase. Reciprocal space

  9. Diamond films grown without seeding treatment and bias by hot-filament CVD system

    Science.gov (United States)

    Ali, M.; Ürgen, M.

    2012-04-01

    Diamond film growth without seeding treatment has been the subject of numerous studies. In the present study, diamond films with/without seeding treatment were grown on silicon using hot-filament chemical vapour deposition. An inexpensive and simple approach, namely, "dry ultrasonic treatment", was introduced in which full coverage of diamond film was achieved on unseeded substrate. For comparison, one substrate was seeded with 5 μm diamond particles, prior to deposition. The resulting diamond films were examined through standard characterization tools and distinct features were observed in each film. Here we present the results of uniform and high purity diamond film, free from nano-sized grains, which is grown without seeding treatment and is expected to be potential candidate for electro-optical applications, particularly as heat sinks.

  10. Effective annealing of ZnO thin films grown by three different SILAR processes

    OpenAIRE

    2015-01-01

    In the present work, zinc oxide (ZnO) thin films have been grown three different cation solution on glass substrates by a simple and economic successive ionic layer absorption and reaction method (SILAR). One of each grown different solution films was annealed to investigate to effective annealing at 473 K for 30 minutes. Absorption measurements showed that the optical band-gaps of all ZnO thin films were wide and were about 3.08-3.31 eV. All films’ band gap increased with annealing. Energy-D...

  11. Electrical properties of ZnO thin films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Pagni, O. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa); Somhlahlo, N.N. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa); Weichsel, C. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa); Leitch, A.W.R. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa)]. E-mail: andrew.leitch@nmmu.ac.za

    2006-04-01

    We report on the electrical characterization of ZnO films grown by MOCVD on glass and sapphire substrates. After correcting our temperature variable Hall measurements by applying the standard two-layer model, which takes into account an interfacial layer, scattering mechanisms in the ZnO films were studied as well as donor activation energies determined. ZnO films grown at different oxygen partial pressures indicated the importance of growth conditions on the defect structure by means of their conductivities and conductivity activation energies.

  12. Luminescence properties of p-type thin CdS films prepared by laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Ullrich, B. [Tokyo Univ. (Japan). Dept. of Physics; Ezumi, H. [Department of Electrical Engineering, Hiroshima-Denki Institute of Technology, Hiroshima 739-03 (Japan); Keitoku, S. [Hiroshima Women`s University, Hiroshima 734 (Japan); Kobayashi, T. [Tokyo Univ. (Japan). Dept. of Physics

    1995-12-01

    Investigations of the luminescence of p-type CdS:Cu thin (less than or equal to 2 {mu}m) films on glass substrate prepared by laser ablation were performed for the first time. The dependences of the luminescence on the Cu content in the thin films were studied at 300 K with argon laser lines at 457.9 nm, 488.0 nm and 514.5 nm. It is demonstrated that the luminescence excited with the 514.5 nm line corresponds to the donor-acceptor transition. Furthermore, it is shown that the intensity of the red emission of CdS:Cu films can be efficiently bleached by Cu doping. (orig.)

  13. A method to form semiconductor quantum dot (QD) thin films by igniting a flame at air-liquid interface: CdS and WO3.

    Science.gov (United States)

    Jadhav, Aarti H; Patil, Sagar H; Sathaye, Shivaram D; Patil, Kashinath R

    2015-02-01

    We reveal an easy, inexpensive, efficient one stepflame synthesis of semiconductor/metal oxide thin films at air-liquid interface, subsequently, transferred on suitable substrate. The method has been illustrated by the formation of CdS and WO3 QDs thin films. The features of the present method are (1) Growth of thin films consisting of0.5-2.0nm sized Quantum Dots (QDs)/(ultra-small nanoparticles) in a short time, at the air-liquid interface which can be suitably transferred by a well-known Blodgett technique to an appropriate substrate, (2) The method is suitable to apply layer by layer (LbL) technique to increase the film thickness as well as forming various compositions as revealed by AFM measurements. The films are characterized for their structure (SAED), morphology (TEM), optical properties (UV-Vis.) and photoluminescence (PL). Possible mechanism of formation of QDs thin film and effect of capping in case of CdS QDs is discussed. Copyright © 2014 Elsevier Inc. All rights reserved.

  14. Europium and samarium doped calcium sulfide thin films grown by PLD

    Science.gov (United States)

    Christoulakis, S.; Suchea, M.; Katsarakis, N.; Koudoumas, E.

    2007-07-01

    Europium and samarium doped calcium sulfide thin films (CaS:Eu,Sm) with different thickness were prepared by the pulsed laser deposition technique using sintered targets. A typical homemade deposition chamber and XeCl excimer laser (308 nm) were employed and the films were deposited in helium atmosphere onto silicon and corning glass substrates. Structural investigations carried out by X-ray diffraction and atomic force microscopy showed a strong influence of the deposition parameters on the film properties. The films grown had an amorphous or polycrystalline structure depending on growth temperature and the number of pulses used, the same parameters affecting the film roughness, the grain shape and dimensions, the film thickness and the optical transmittance. This work indicates that pulsed laser deposition can be a suitable technique for the preparation of CaS:Eu,Sm thin films, the film characteristics being controlled by the growth conditions.

  15. Single-crystal semiconductor films grown on foreign substrates

    Science.gov (United States)

    Vohl, P.

    1966-01-01

    Intermediate alloy formed between foreign substrates and semiconductor material enable the growth of single crystal semiconductor films on the alloy layer. The melted film must not ball up on the surface of the substrate and neither chemically react nor alloy with the intermediate alloy formed on the substrate.

  16. RETRACTED: Ammonia-free method for synthesis of CdS nanocrystalline thin films through chemical bath deposition technique

    Science.gov (United States)

    Karimi, M.; Rabiee, M.; Moztarzadeh, F.; Bodaghi, M.; Tahriri, M.

    2009-11-01

    This article has been retracted: please see Elsevier Policy on Article Withdrawal ( http://www.elsevier.com/locate/withdrawalpolicy). This article has been retracted at the request of the Editor-in-Chief of Solid State Communications as the authors have plagiarized part of a paper that has also appeared in Current Applied Physics: Controlled synthesis, characterization and optical properties of CdS nanocrystalline thin films via chemical bath deposition (CBD) route Meysam Karimi, Mohammad Rabiee, Fathollah Moztarzadeh, Mohammadreza Tahriri and Masoud Bodaghi; Curr. Appl. Phys., 9 (2009) 1263-1268, doi: 10.1016/j.cap.2009.02.006. One of the conditions of submission of a paper for publication is that authors declare explicitly that their work is original and has not appeared in a publication elsewhere. Re-use of any data should be appropriately cited. As such this article represents a severe abuse of the scientific publishing system. The scientific community takes a very strong view on this matter and apologies are offered to readers of the journal that this was not detected during the submission process.

  17. A Comparison between AlN Films Grown by MOCVD Using Dimethylethylamine Alane and Trimethylaluminium as the Aluminium Precursors

    Institute of Scientific and Technical Information of China (English)

    HU Wei-Guo; PAN Yi; LIU Xiang-Lin; ZHANG Pan-Feng; ZHAO Feng-Ai; JIAO Chun-Mei; WEI Hong-Yuan; ZHANG Ri-Qing; WU Jie-Jun; CONG Guang-Wei

    2007-01-01

    Aluminium nitride (AlN) films grown with dimethylethylamine alane (DMEAA) are compared with the ones grown with trimethylaluminium (TMA). In the high-resolution x-ray diffraction Ω scans, the full width at half maximum (FWHM) of (0002) AlN films grown with DMEAA is about 0.70 deg, while the FWHM of (0002)AlN films grown with TMA is only 0.11 deg. The surface morphologies of the films are different, and the rms roughnesses of the surface are approximately identical. The rms roughness of AlN films grown with DMEAA is 47.4 nm, and grown with TMA is 69.4 nm. Although using DMEAA as the aluminium precursor cannot improve the AlN crystal quality, AlN growth can be reached at low temperature of 673 K. Thus, DMEAA is an alternative aluminium precursor to deposit AlN film at low growth temperatures.

  18. Effect of surface treatment on hot-filament chemical vapour deposition grown diamond films

    Science.gov (United States)

    Ali, M.; Ürgen, M.; Atta, M. A.

    2012-02-01

    Diamond film growth without seeding treatment has been the subject of numerous studies. In this study, diamond films with/without seeding treatment were grown on silicon using hot-filament chemical vapour deposition. An inexpensive and simple approach, namely ‘dry ultrasonic treatment’, was introduced in which full coverage of the diamond film was achieved over the substrate having no prior seeding treatment. For comparison purposes, two substrates were seeded with different sizes of diamond particles, 5 µm by hand and 30-40 µm by ultrasonic agitation, prior to deposition. The produced diamond films were examined through standard characterization tools and distinct features were observed in each film. The diamond film grown without the seeding treatment shows slightly lower growth rate (1 µm h-1) but bigger grain size up to 8 µm compared with seeded films. Here we show the growth of uniform and high-purity diamond films free from nano-sized grains, which are grown without any seeding treatment.

  19. Electrochromic behavior in CVD grown tungsten oxide films

    Science.gov (United States)

    Gogova, D.; Iossifova, A.; Ivanova, T.; Dimitrova, Zl; Gesheva, K.

    1999-03-01

    Solid state electrochemical devices (ECDs) for smart windows, large area displays and automobile rearview mirrors are of considerable technological and commercial interest. In this paper, we studied the electrochromic properties of amorphous and polycrystalline CVD carbonyl tungsten oxide films and the possibility for sol-gel thin TiO 2 film to play the role of passive electrode in an electrochromic window with solid polymer electrolyte.

  20. Electrochromic behavior in CVD grown tungsten oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Gogova, D.; Iossifova, A.; Ivanova, T.; Gesheva, K.; Dimitrova, Z. [Central Laboratory for Solar Energy and New Energy Sources at Bulgarian Academy of Science, 72 Tzarigradsko shossee Blvd., Sofia (Bulgaria)

    1999-03-15

    Solid state electrochemical devices (ECDs) for smart windows, large area displays and automobile rearview mirrors are of considerable technological and commercial interest. In this paper, we studied the electrochromic properties of amorphous and polycrystalline CVD carbonyl tungsten oxide films and the possibility for sol-gel thinTiO{sub 2} film to play the role of passive electrode in an electrochromic window with solid polymer electrolyte

  1. Epitaxial thin films grown by pulsed laser deposition

    NARCIS (Netherlands)

    Blank, D.H.A.

    2005-01-01

    In this paper, we present the pulsed laser deposition (PLD) technique to control the growth of metal oxide materials at atomic level using high-pressure reflective high-energy electron diffraction and ellipsometry. These developments have helped to make PLD a grown-up technique to fabricate complex

  2. Phase transition of bismuth telluride thin films grown by MBE

    DEFF Research Database (Denmark)

    Fülöp, Attila; Song, Yuxin; Charpentier, Sophie

    2014-01-01

    A previously unreported phase transition between Bi2Te3 and Bi4Te3 in bismuth telluride grown by molecular beam epitaxy is recorded via XRD, AFM, and SIMS observations. This transition is found to be related to the Te/Bi beam equivalent pressure (BEP) ratio. BEP ratios below 17 favor the formation...

  3. PbTe thin films grown by femtosecond pulsed laser deposition

    Science.gov (United States)

    Rodriguez, E.; Silva, D.; Moya, L.; Cesar, C. L.; Barbosa, L. C.; Schrank, A.; Souza Filho, C. R.; de Oliveira, E. P.

    2007-09-01

    PbTe thin films were grown on BK7 glass and Si(100) substrates using femtosecond pulsed laser deposition at room temperature. The influence of the background pressure and the laser fluence on the structural and optical characteristics of the PbTe films was studied. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) were used to characterize the surface and structural properties of the deposited PbTe thin films, respectively. Transmission spectroscopy measurements in the visible and infrared region (VIS-IR) were used to investigate the optical properties of the PbTe thin films.

  4. Growth and atomic structure of tellurium thin films grown on Bi2Te3

    Science.gov (United States)

    Okuyama, Yuma; Sugiyama, Yuya; Ideta, Shin-ichiro; Tanaka, Kiyohisa; Hirahara, Toru

    2017-03-01

    We have grown tellurium (Te) thin films on Bi2Te3 and investigated the atomic structure. From low-energy electron diffraction (LEED) measurements, we found that the Te films are [10 1 bar0]-oriented with six domains. A detailed analysis of the reflection high-energy electron diffraction (RHEED) pattern revealed that the films are strained with the in-plane lattice constant compressed by ∼1.5% compared to the bulk value due to the epitaxy between Te and Bi2Te3. These films will be interesting systems to investigate the predicted topological phases that occur in strained Te.

  5. Morphological and chemical study of the initial growth of CdS thin films deposited using an ammonia-free chemical process

    Energy Technology Data Exchange (ETDEWEB)

    Mazon-Montijo, D.A.; Sotelo-Lerma, M.; Quevedo-Lopez, M. [Centro de Investigacion en Polimeros y Materiales, Universidad de Sonora, Apdo. Postal 130, 83190 Hermosillo, Son. (Mexico); El-Bouanani, M. [Department of Materials Science and Engineering, University of North Texas, P.O. Box 305310 Denton, TX 76203-5310 (United States); Alshareef, H.N. [SEMATECH, 2706 Montopolis Drive, Austin, TX 78741 (United States); Espinoza-Beltran, F.J. [Centro de Investigacion y Estudios Avanzados del IPN, Unidad Queretaro, Apdo. Postal 1-798, 76001 Queretaro, Qro. (Mexico); Ramirez-Bon, R. [Centro de Investigacion y Estudios Avanzados del IPN, Unidad Queretaro, Apdo. Postal 1-798, 76001 Queretaro, Qro. (Mexico)], E-mail: rrbon@qro.cinvestav.mx

    2007-11-15

    We study the initial growth stages of CdS thin films deposited by an ammonia-free chemical bath deposition process. This ammonia-free process is more environmentally benign because it reduces potential ammonia release to the environment due to its high volatility. Instead of ammonia, sodium citrate was used as the complexing agent. We used atomic force microscopy (AFM), Rutherford backscattering (RBS) and X-ray photoelectron spectroscopy (XPS) to investigate the morphological and chemical modifications at the substrate surface during the first initial stages of the CdS deposition process. Additionally, X-ray diffraction (XRD) and optical transmission spectroscopy measurements were carried out to compliment the study. XPS results show that the first nucleation centers are composed by Cd(OH){sub 2} which agglomerate in patterns of bands, as demonstrated by AFM results. It is also observed that the conversion to CdS (by anionic exchange) of the first nucleus begins before the substrate surface is completely covered by a homogenous film.

  6. Property modulation of NiO films grown by radio frequency magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Chen, T.F.; Wang, A.J.; Shang, B.Y. [Department of Physics, Beijing Normal University, Beijing 100875 (China); Wu, Z.L.; Li, Y.L. [Analytical and Testing Center, Beijing Normal University, Beijing 100875 (China); Wang, Y.S., E-mail: yswang@bnu.edu.cn [Department of Physics, Beijing Normal University, Beijing 100875 (China)

    2015-09-15

    Highlights: • Controllable and preferential growth of NiO films were performed successfully on Si substrates. • Oxygen partial pressure lower than 6% is crucial for transformation of the preferential growth. • The film deposition rate is very sensitive to the low oxygen partial pressure. • NiO lattice expands quadratically with the increasing of oxygen partial pressures. • The films contain high concentration of Ni vacancies and show a good rectifying behavior with p-Si. - Abstract: NiO films were grown on Si substrates by radio frequency magnetron sputtering. The films were analyzed by an X-ray diffractometer, scanning electron microscope, X-ray photoelectron spectroscopy and SCS-4200 semiconductor characterization system. Evolution of the growth mode, lattice strain, morphology, chemistry states and electrical properties were investigated systematically. The film deposition rates and properties are very sensitive to the oxygen partial pressure lower than 10%. It is crucial to decrease the oxygen partial pressure to 2% for (1 1 1) film growth and the films would transform from (1 1 1) to (1 0 0) as the oxygen partial pressure increases from 2% to 6%. The film lattice expands quadratically with the increase of oxygen partial pressure. Nickel vacancy concentration in (1 1 1) films is much higher than that in (1 0 0) films. All (1 0 0) films show good rectifying behavior with p-Si. The film growth modes and properties could be modulated flexibly by controlling the oxygen partial pressures.

  7. Morphology and photoresponse of crystalline antimony film grown on mica by physical vapor deposition

    Directory of Open Access Journals (Sweden)

    Shafa Muhammad

    2016-09-01

    Full Text Available Antimony is a promising material for the fabrication of photodetectors. This study deals with the growth of a photosensitive thin film by the physical vapor deposition (PVD of antimony onto mica surface in a furnace tube. The geometry of the grown structures was studied via scanning electron microscopy (SEM, X-ray diffraction (XRD, energy-dispersive X-ray spectroscopy (EDX and elemental diffraction analysis. XRD peaks of the antimony film grown on mica mostly matched with JCPDF Card. The formation of rhombohedral crystal structures in the film was further confirmed by SEM micrographs and chemical composition analysis. The Hall measurements revealed good electrical conductivity of the film with bulk carrier concentration of the order of 1022 Ω·cm-3 and mobility of 9.034 cm2/Vs. The grown film was successfully tested for radiation detection. The photoresponse of the film was evaluated using its current-voltage characteristics. These investigations revealed that the photosensitivity of the antimony film was 20 times higher than that of crystalline germanium.

  8. Oxygen Ion Conductance in Epitaxially Grown Thin Film Electrolytes

    Energy Technology Data Exchange (ETDEWEB)

    Thevuthasan, Suntharampillai; Yu, Zhongqing; Kuchibhatla, Satyanarayana V N T; Saraf, Laxmikant V.; Marina, Olga A.; Shutthanandan, V.; Nachimuthu, Ponnusamy; Wang, Chong M.

    2009-04-01

    This paper briefly summarizes the results from a project aimed to develop an understanding of oxygen ionic transport processes in highly oriented thin film oxide materials to enable the design of new types of electrolyte materials for solid state electrochemical devices. We have used oxygen-plasma-assisted molecular beam epitaxy (OPA-MBE) to grow highly oriented doped ceria, zriconia thin films on single crystal c-Al2O3 along with multilayered hetero-structures. The influence of dopant concentration, interfaces, defects and crystalline quality on oxygen ionic conductivity has been critically analyzed using various surface and bulk sensitive capabilities. Although, preferred (111) orientation was preserved in high quality samaria doped ceria films up to a 10 atom% Sm doping, the films started to show polycrystalline features for higher Sm doping. Maximum conductivity was obtained for 5 atom% Sm doping in ceria. In the case of gadolinia doped ceria/zirconia multi-layer films, total conductivity was found to increase with the increasing number of layers.

  9. Studies on electrochemically grown Cd-Fe-Se thin films

    Energy Technology Data Exchange (ETDEWEB)

    Mahalingam, T. [Alagappa Univ., Karaikudi (India). Dept. of Physics; Ajou Univ., Suwon (Korea, Republic of). Dept. of Electrical and Computer Engineering; Thanikaikarasan, S.; Raja, M.; Sanjeeviraja, C. [Alagappa Univ., Karaikudi (India). Dept. of Physics; Lee, S.; Moon, H.; Kim, Y.D. [Ajou Univ., Suwon (Korea, Republic of). Dept. of Molecular Science and Technology; Sebastian, P.J. [CIE-UNAM, Temixco, Morelos (Mexico); Chipas Polytechnical Univ., Chipas (Mexico)

    2007-01-15

    This paper presented the results of a study that investigated the electrochemical, structural, compositional, morphological and photoelectrochemical properties of cadmium ferrous selenide (Cd-Fe-Se) semiconducting thin films electrodeposited onto conducted tin oxide (SnO{sub 2}) coated glass substrates at various cadmium sulfate concentrations in the deposition bath. Experimental details were provided along with results of typical cyclic voltammograms of Cd-Fe-Se thin film cathodically deposited from an acid solution containing CdSO{sub 4}, FeSO{sub 4} and SeO{sub 2} without any additives. Variations in film thickness were determined along with compositional analysis and morphological studies. Photoelectrochemical (PEC) solar cell studies were performed in a cell consisting of photoelectrode (Cd-Fe{sub S}e), a platinum counter electrode and a saturated dalomel reference electrode. A hot probe method identified the nature of the thin film to be n-type, while the structure was found to be hexagon for CdSe, tetragonal for {alpha}-FeSe and orthorhombic for FeSe{sub 2}. According to energy dispersive analysis of X-rays (EDAX), the stoichiometric values of Cd and Se are obtained at higher concentration of CdSO{sub 4}. The maximum concentration of CD{sup 2+} ions in the solution bath yielded thin films with smooth surfaces. 18 refs., 1 tab., 6 figs.

  10. Pyroelectric and piezoelectric responses of thin AlN films epitaxy-grown on a SiC/Si substrate

    Science.gov (United States)

    Kukushkin, S. A.; Osipov, A. V.; Sergeeva, O. N.; Kiselev, D. A.; Bogomolov, A. A.; Solnyshkin, A. V.; Kaptelov, E. Yu.; Senkevich, S. V.; Pronin, I. P.

    2016-05-01

    This paper presents the results of pyroelectric and piezoelectric studies of AlN films formed by chloride-hydride epitaxy (CHE) and molecular beam epitaxy (MBE) on epitaxial SiC nanolayers grown on Si by the atom substitution method. The surface topography and piezoelectric and pyroelecrtric responses of AlN films have been analyzed. The results of the study have shown that the vertical component of the piezoresponse in CHE-grown AlN films is more homogeneous over the film area than that in MBE-grown AlN films. However, the signal from the MBE-synthesized AlN films proved to be stronger. The inversion of the polar axis (polarization vector) on passage from MBE-grown AlN films to CHE-grown AlN films has been found experimentally. It has been shown that the polar axis in MBE-grown films is directed from the free surface of the film toward the Si substrate while, in CHE-grown films, the polarization vector is directed toward the free surface.

  11. Nanocrystalline magnetite thin films grown by dual ion-beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Prieto, Pilar, E-mail: pilar.prieto@uam.es [Departamento de Física Aplicada M-12, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Ruiz, Patricia [Departamento de Física Aplicada M-12, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Ferrer, Isabel J. [Departamento de Física de Materiales M-4, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Figuera, Juan de la; Marco, José F. [Instituto de Química Física “Rocasolano”, CSIC, Serrano 119, 28006 Madrid (Spain)

    2015-07-05

    Highlights: • We have grown tensile and compressive strained nanocrystalline magnetite thin films by dual ion beam sputtering. • The magnetic and thermoelectric properties can be controlled by the deposition conditions. • The magnetic anisotropy depends on the crystalline grain size. • The thermoelectric properties depend on the type of strain induced in the films. • In plane uniaxial magnetic anisotropy develops in magnetite thin films with grain sizes ⩽20 nm. - Abstract: We have explored the influence of an ion-assisted beam in the thermoelectric and magnetic properties of nanocrystalline magnetite thin films grown by ion-beam sputtering. The microstructure has been investigated by XRD. Tensile and compressive strained thin films have been obtained as a function of the parameters of the ion-assisted beam. The evolution of the in-plane magnetic anisotropy was attributed to crystalline grain size. In some films, magneto-optical Kerr effect measurements reveal the existence of uniaxial magnetic anisotropy induced by the deposition process related with a small grain size (⩽20 nm). Isotropic magnetic properties have observed in nanocrystalline magnetite thin film having larger grain sizes. The largest power factor of all the films prepared (0.47 μW/K{sup 2} cm), obtained from a Seebeck coefficient of −80 μV/K and an electrical resistivity of 13 mΩ cm, is obtained in a nanocrystalline magnetite thin film with an expanded out-of-plane lattice and with a grain size ≈30 nm.

  12. Epitaxial Cu(001) films grown on a Cr/Ag/Fe/GaAs(001) buffer system

    Energy Technology Data Exchange (ETDEWEB)

    Gottlob, Daniel M., E-mail: d.gottlob@fz-juelich.de [Peter Grünberg Institut, Electronic Properties (PGI-6), Forschungszentrum Jülich, 52425 Jülich (Germany); Fakultät für Physik and Center for Nanointegration Duisburg-Essen (CeNIDE), Universität Duisburg-Essen, 47048 Duisburg (Germany); Jansen, Thomas [Peter Grünberg Institut, Electronic Properties (PGI-6), Forschungszentrum Jülich, 52425 Jülich (Germany); Jülich-Aachen Research Alliance, Fundamentals for Future Information Technology (JARA-FIT), Forschungszentrum Jülich, 52425 Jülich (Germany); Hoppe, Michael [Peter Grünberg Institut, Electronic Properties (PGI-6), Forschungszentrum Jülich, 52425 Jülich (Germany); Bürgler, Daniel E. [Peter Grünberg Institut, Electronic Properties (PGI-6), Forschungszentrum Jülich, 52425 Jülich (Germany); Jülich-Aachen Research Alliance, Fundamentals for Future Information Technology (JARA-FIT), Forschungszentrum Jülich, 52425 Jülich (Germany); and others

    2014-07-01

    We present a procedure to prepare single-crystalline, high-purity Cu(001) films (templates) suitable as substrates for subsequent epitaxial thin-film growth. The template films were grown in a dedicated molecular-beam epitaxy system on a Cr/Ag/Fe/GaAs(001) buffer layer system. Low-energy electron diffraction and X-ray diffraction were applied to determine the surface orientation and the epitaxial relationship between all layers of the stack. Post-annealing at moderate temperatures enhances the quality of the film as shown by low-energy electron diffraction and atomic force microscopy. X-ray photoemission and Auger electron spectroscopy confirm that no atoms of the buffer layers diffuse into the Cu film during the initial preparation and the post-annealing treatment. The completed Cu(001) template system can be exposed to air and afterwards refurbished by Ar{sup +}-ion bombardment and annealing, enabling the transfer between vacuum systems. The procedure provides suitable conductive thin film templates for studies of epitaxial thin films, e.g. on the magnetic and magnetotransport properties of Co and Ni based films and multilayers. - Highlights: • Preparation of epitaxial Cu(001) template films on an insulating substrate • Characterization of template structure, orientation, cleanness, and roughness • Template films can be exposed to air and refurbished in different vacuum system. • Template films are suitable for further thin film growth at up to 570 K.

  13. Ultrafast carrier dynamics in purified and as-grown single-walled carbon nanotube films

    Institute of Scientific and Technical Information of China (English)

    Long Yong-Bing; Song Li; Zhang Chun-Yu; Wang Li; Fu Pan-Ming; Zhang Zhi-Guo; Xie Si-Shen; Wang Guo-Ping

    2005-01-01

    Ultrafast time-resolved optical transmissions in purified and as-grown single-walled carbon nanotube films are measured at a temperature of 200K. The signal of the purified sample shows a crossover from photobleaching to photoabsorption. The former and the latter are interpreted as the state filling and the red shift of the π-plasmon,respectively. The signal of the as-grown sample can be perfectly fitted by a single-exponential with a time constant of 232fs. The disappearance of the negative component in the as-grown sample is attributed to the charge transfer between the semiconducting nanotubes and the impurities.

  14. Molecular alignments in sexiphenyl thin films epitaxially grown on muscovite

    Energy Technology Data Exchange (ETDEWEB)

    Plank, H.; Resel, R.; Sitter, H.; Andreev, A.; Sariciftci, N.S.; Hlawacek, G.; Teichert, C.; Thierry, A.; Lotz, B

    2003-10-22

    The epitaxial orientations of highly crystalline para-sexiphenyl (C{sub 36}H{sub 26}) films on mica (001) surfaces are investigated by selected area electron diffraction (SAED) and transmission electron microscopy (TEM). Films at the early growth stage (growth time 26 s) and at an advanced growth stage (growth time 10 min) are studied. Films at the early growth stage exhibit only three-dimensional islands with an average size of 60x30x10 nm{sup 3}, whereas films at an advanced growth stage consist of long oriented nano-fibres with a needle-like morphology. We identified three different types of epitaxial relations between the mica (001) substrate and the sexiphenyl crystallites, which are the same in both growth stages. Moreover, within a single island as well as within a single fibre crystalline domains with these three epitaxial orientations are observed. At the advanced growth stage, these domains are aligned antiparallel or perpendicular to the fibre axes; the typical size of the domains is 20 nm.

  15. Lightweight sodium alanate thin films grown by reactive sputtering

    NARCIS (Netherlands)

    Filippi, M.; Rector, J.H.; Gremaud, R.; Van Setten, M.J.; Dam, B.

    2009-01-01

    We report the preparation of sodium alanate, a promising hydrogen storage material, in a thin film form using cosputtering in a reactive atmosphere of atomic hydrogen. We study the phase formation and distribution, and the hydrogen desorption, with a combination of optical and infrared transmission

  16. Pure electron-electron dephasing in percolative aluminum ultrathin film grown by molecular beam epitaxy.

    Science.gov (United States)

    Lin, Shih-Wei; Wu, Yue-Han; Chang, Li; Liang, Chi-Te; Lin, Sheng-Di

    2015-01-01

    We have successfully grown ultrathin continuous aluminum film by molecular beam epitaxy. This percolative aluminum film is single crystalline and strain free as characterized by transmission electron microscopy and atomic force microscopy. The weak anti-localization effect is observed in the temperature range of 1.4 to 10 K with this sample, and it reveals that, for the first time, the dephasing is purely caused by electron-electron inelastic scattering in aluminum.

  17. Preparation and characterization of GaN films grown on Ga-diffused Si(111) substrates

    Institute of Scientific and Technical Information of China (English)

    SUN Zhencui; CAO Wentian; WEI Qinqin; WANG Shuyun; XUE Chengshan; SUN Haibo

    2005-01-01

    Hexagonal GaN films were prepared by nitriding Ga2O3 films with flowing ammonia. Ga2O3 films were deposited on Ga-diffused Si (111) substrates by radio frequency (r.f.) magnetron sputtering. This paper have investigated the change of structural properties of GaN films nitrided in NH3 atmosphere at the temperatures of 850, 900, and 950℃ for 15min and nitrided at the temperature of 900℃ for 10, 15, and 20 min, respectively. X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS) were used to analyze the structure, surface morphology and composition of synthesized samples. The results reveal that the as-grown films are polycrystalline GaN with hexagonal wurtzite structure and GaN films with the highest crystal quality can be obtained when nitrided at 900℃ for 15 min.

  18. Characterisation of molecular thin films grown by organic molecular beam deposition

    CERN Document Server

    Bayliss, S M

    2000-01-01

    This work concerns the growth and characterisation of molecular thin films in an ultra high vacuum regime by organic molecular beam deposition (OMBD). Films of three different molecular materials are grown, namely free base phthalocyanine (H sub 2 Pc), perylene 3,4,9,10-tetracarboxylic dianhydride (PTCDA) and aluminium tris-8-hydroxyquinoline (Alq sub 3). The relationship between the growth parameters such as film thickness, growth rate, and substrate temperature during and after growth, and the structural, optical and morphological properties of the film are investigated. These investigations are carried out using various ex-situ techniques. X-ray diffraction, Raman spectroscopy and electronic absorption spectroscopy are used to probe the bulk film characteristics, whilst Nomarski microscopy and atomic force microscopy are used to study the surface morphology. Three different levels of influence of the growth parameters on the film properties are observed. In the case of H sub 2 Pc, two crystal phases are fo...

  19. Thermoelectric properties of epitaxial β-FeSi2 thin films grown on Si(111) substrates with various film qualities

    Science.gov (United States)

    Watanabe, Kentaro; Taniguchi, Tatsuhiko; Sakane, Shunya; Aoki, Shunsuke; Suzuki, Takeyuki; Fujita, Takeshi; Nakamura, Yoshiaki

    2017-05-01

    Si-based epitaxial β-FeSi2 thin films are attractive as materials for on-chip thermoelectric power generators. We investigated the structure, crystallinity, and thermoelectric properties of β-FeSi2 thin films epitaxially grown on Si(111) substrates by using three different techniques: conventional reactive deposition epitaxy followed by molecular beam epitaxy (RDE+MBE), solid phase epitaxy (SPE) based on codeposition of Fe and Si presented previously, and SPE followed by MBE (SPE+MBE) presented newly by this work. Their epitaxial growth temperatures were fixed at 530 °C for comparison. RDE+MBE thin films exhibited high crystalline quality, but rough surfaces and rugged β-FeSi2/Si(111) interfaces. On the other hand, SPE thin films showed flat surfaces and abrupt β-FeSi2/Si(111) interfaces but low crystallinity. We found that SPE+MBE thin films realized crystallinity higher than SPE thin films, and also had flatter surfaces and sharper interfaces than RDE+MBE thin films. In SPE+MBE thin film growth, due to the initial SPE process with low temperature codeposition, thermal interdiffusion of Fe and Si was suppressed, resulting in the surface flatness and abrupt interface. Second high temperature MBE process improved the crystallinity. We also investigated thermoelectric properties of these β-FeSi2 thin films. Structural factors affecting the thermoelectric properties of RDE+MBE, SPE, and SPE+MBE thin films were investigated.

  20. Microstructure, Photoluminescent Properties and Application of ZnO Films Grown on Al Foils

    Institute of Scientific and Technical Information of China (English)

    WU Hongyan; ZHAO Jiayu; XIE Aigen; XU Linhua; ZHONG Kun; SHEN Tongtong

    2015-01-01

    To obtain safety working before long-term early warning, we proposed a process for the preparation of luminescent films on metal substrate to detect the wear life. ZnO films were prepared on aluminum (Al) foils by the magnetron sputtering technique. The microstructure, tribological properties and photoluminescence (PL) spectra of ZnO films before and after the friction test were investigated. The microstructure of ZnO films grown on Al foils exhibited a closely packed hexagonal cone shape. ZnO films were grown along the orientation perpendicular to the substrate. The tribometric tests revealed that the average friction coefficient of ZnO films was lower and more stable than that of the substrate. The results of PL spectra indicated that the effect of Al element on ZnO films led to shifts of the defect related visible band. The luminescent center of ZnO films shifted from the emission peak at 510 nm before the friction to 647 nm after the friction, indicating that the green light shifted into the red light as the friction occurred. The visible light was helpful to understanding the failure characteristics during the friction and wear, and provide an early indicator of the impending failure.

  1. Effect of Annealing Temperature on the Optical Spectra of CdS Thin Films Deposited at Low Solution Concentrations by Chemical Bath Deposition (CBD Technique

    Directory of Open Access Journals (Sweden)

    Zahid Rizwan

    2011-02-01

    Full Text Available Two different concentrations of CdCl2 and (NH22CS were used to prepare CdS thin films, to be deposited on glass substrate by chemical bath deposition (CBD technique. CdCl2 (0.000312 M and 0.000625 M was employed as a source of Cd2+ while (NH22CS (0.00125 M and 0.000625 M for S2− at a constant bath temperature of 70 °C. Adhesion of the deposited films was found to be very good for all the solution concentrations of both reagents. The films were air-annealed at a temperature between 200 °C to 360 °C for one hour. The minimum thickness was observed to be 33.6 nm for film annealed at 320 °C. XRD analyses reveal that the films were cubic along with peaks of hexagonal phase for all film samples. The crystallite size of the films decreased from 41.4 nm to 7.4 nm with the increase of annealing temperature for the CdCl2 (0.000312 M. Optical energy band gap (Eg, Urbach energy (Eu and absorption coefficient (α have been calculated from the transmission spectral data. These parameters have been discussed as a function of annealing temperature and solution concentration. The best transmission (about 97% was obtained for the air-annealed films at higher temperature at CdCl2 (0.000312 M.

  2. Chemically grown vertically aligned 1D ZnO nanorods with CdS coating for efficient quantum dot sensitized solar cells (QDSSC): a controlled synthesis route.

    Science.gov (United States)

    Mali, Sawanta S; Kim, Hyungjin; Patil, Pramod S; Hong, Chang Kook

    2013-12-28

    In the present article, vertically aligned ZnO nanorod arrays were synthesized by an aqueous chemical growth (ACG) route on a fluoride doped tin oxide (FTO) coated glass substrate. These nanorods were further sensitized with cadmium sulfide (CdS) quantum dots (QDs) by a successive ionic layer adsorption and reaction (SILAR) technique. The synthesized CdS coated ZnO nanorods were characterized for their structural and morphological properties with X-ray diffraction (XRD), high resolution transmission electron microscopy (HRTEM), X-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscopy (FESEM). Finally, prepared CdS coated 1D ZnO photoelectrodes were tested for their photoelectrochemical performance. Our results show that the sample deposited after 40 SILAR cycles shows 5.61 mA cm(-2) short current density (JSC) with η = 1.61% power conversion efficiency.

  3. Solid Lubrication of Laser Grown Fluorinated Diamond Thin Films

    Science.gov (United States)

    1992-01-21

    irradiation of laser beam on the substrate surface 2 Schematic diagram showing laser CVD experimental set- up . 27 A single laser beam (YAG or Excimer) was only...0.05 to 0.2 depending upon temperature, environment, load, speed and presence of foreign material. Todate , ultra-low coefficients of friction (0.02...Laser technology for diamond film fabrication is very new and todate only a handful number of publications are available that address directly on the

  4. Hybrid Organic-Inorganic Films Grown Using Molecular Layer Deposition

    Science.gov (United States)

    2011-03-01

    discussed below for the MLD of the alucone based on TMA and glycerol . Alternatively, a heterobifunctional precursor, such as ethanolamine, HO- CH2...amine-terminated surface functional groups to reform carboxylic groups through a ring-opening reaction in reaction C given by Eqn. 5. The three-step...small amount of cross-linking in the MLD film. These problems with the TMA + EG MLD system led to the recent exploration of the TMA + glycerol system

  5. Strain relaxation in thin films of Cu grown on Ni(001)

    DEFF Research Database (Denmark)

    Rasmussen, F.B.; Baker, J.; Nielsen, M.;

    1998-01-01

    Surface X-ray diffraction and kinematical model calculations are used to determine the strain relaxation of embedded wedges with internal (111) facets formed in thin Cu films when grown on Ni(001). We show the wedges to be inhomogenously strained with a large lateral relaxation near the Cu...

  6. Crystallinity Improvement of ZnO Thin Film on Different Buffer Layers Grown by MBE

    OpenAIRE

    2012-01-01

    The material and optical properties of ZnO thin film samples grown on different buffer layers on sapphire substrates through a two-step temperature variation growth by molecular beam epitaxy were investigated. The thin buffer layer between the ZnO layer and the sapphire substrate decreased the lattice mismatch to achieve higher quality ZnO thin film growth. A GaN buffer layer slightly increased the quality of the ZnO thin film, but the threading dislocations still stretched along the c-axis o...

  7. Electrical phase change of CVD-grown Ge-Sb-Te thin film device

    OpenAIRE

    Huang, C.C.; B. Gholipour; Ou, J.Y.; Knight, K.J.; Hewak, D. W.

    2011-01-01

    A prototype Ge-Sb-Te thin film phase-change memory device has been fabricated and reversible threshold and phase change switching demonstrated electrically, with a threshold voltage of 1.5 – 1.7 V. The Ge-Sb-Te thin film was fabricated by chemical vapour deposition (CVD) at atmospheric pressure using GeCl4, SbCl5, and Te precursors with reactive gas H2 at reaction temperature 780 °C and substrate temperature 250 °C. The surface morphology and composition of the CVD-grown Ge-Sb-Te thin film ha...

  8. Magnetization reversal of ultrathin Fe film grown on Si(111) using iron silicide template

    Institute of Scientific and Technical Information of China (English)

    He Wei; Zhan Qing-Feng; Wang De-Yong; Chen Li-Jun; Sun Young; Cheng Zhao-Hua

    2007-01-01

    Ultrathin Fe films were epitaxially grown on Si(111) by using an ultrathin iron silicide film with p(2 × 2) surface reconstruction as a template. The surface structure and magnetic properties were investigated in situ by low energy electron diffraction (LEED), scanning tunnelling microscopy (STM), and surface magneto-optical effect (SMOKE). Polar SMOKE hysteresis loops demonstrate that the Fe ultrathin films with thickness t< 6 ML (monolayers) exhibit perpendicular magnetic anisotropy. The characters of M-H loops with the external magnetic field at difference angles and the angular dependence of coercivity suggest that the domain-wall pinning plays a dominant role in the magnetization reversal process.

  9. Effects of ultraviolet light on B-doped CdS thin films prepared by spray pyrolysis method using perfume atomizer

    Energy Technology Data Exchange (ETDEWEB)

    Novruzov, V.D. [Department of Physics, Recep Tayyip Erdogan University, Rize (Turkey); Keskenler, E.F., E-mail: keskenler@gmail.com [Department of Nanotechnology Engineering, Recep Tayyip Erdogan University, Rize (Turkey); Tomakin, M. [Department of Physics, Recep Tayyip Erdogan University, Rize (Turkey); Kahraman, S. [Department of Physics, Mustafa Kemal University, Hatay (Turkey); Gorur, O. [Department of Physics, Abant Izzet Baysal University, Bolu (Turkey)

    2013-09-01

    Boron doped CdS thin films were deposited by spray pyrolysis method using perfume atomizer. The effects of ultraviolet light on the structural, optical and electrical properties of B-doped CdS thin films were investigated as a function of dopant concentration (B/Cd). X-ray diffraction studies showed that all samples were polycrystalline nature with hexagonal structure. It was determined that the preferred orientation of non-illuminated samples changes from (1 0 1) to (0 0 2) with B concentration. The c lattice constant of films decreases from 6.810 Å to 6.661 Å with boron doping. The XRD peak intensity increased with the illumination for almost all the samples. The lattice parameters of B-doped samples remained nearly constant after illumination. It was found that the optical transmittance, photoluminescence spectra, resistivity and carrier concentration of the B-doped samples are stable after the illumination with UV light. Also the effects of UV light on B-doped CdS/Cu{sub 2}S solar cell were investigated and it was determined that photoelectrical parameters of B-doped solar cell were more durable against the UV light.

  10. Effects of ultraviolet light on B-doped CdS thin films prepared by spray pyrolysis method using perfume atomizer

    Science.gov (United States)

    Novruzov, V. D.; Keskenler, E. F.; Tomakin, M.; Kahraman, S.; Gorur, O.

    2013-09-01

    Boron doped CdS thin films were deposited by spray pyrolysis method using perfume atomizer. The effects of ultraviolet light on the structural, optical and electrical properties of B-doped CdS thin films were investigated as a function of dopant concentration (B/Cd). X-ray diffraction studies showed that all samples were polycrystalline nature with hexagonal structure. It was determined that the preferred orientation of non-illuminated samples changes from (1 0 1) to (0 0 2) with B concentration. The c lattice constant of films decreases from 6.810 Å to 6.661 Å with boron doping. The XRD peak intensity increased with the illumination for almost all the samples. The lattice parameters of B-doped samples remained nearly constant after illumination. It was found that the optical transmittance, photoluminescence spectra, resistivity and carrier concentration of the B-doped samples are stable after the illumination with UV light. Also the effects of UV light on B-doped CdS/Cu2S solar cell were investigated and it was determined that photoelectrical parameters of B-doped solar cell were more durable against the UV light.

  11. Stability Effect In Photoconducting Studies of Some Chemically Deposited CdS, (Cd-Pb)S and (Cd-Zn)S Films

    OpenAIRE

    2008-01-01

    Stability effects in photoconductivity (PC) rise and decay have been studied over a period of 2 years in thin films of (Cd-Pb)S:LiF, La/Pr and (Cd-Zn)S: LiF,La/Pr and have been found quite stable; however, those of CdS are not that stable. Results of annealing effect are also included, which present more stable values. XRD studies show prominent lines of base materials. Further, XRD and SEM studies show the particle sizes are in the nanometer range. Results of optical absorption sp...

  12. RF Magnetron Sputtering Grown Cu2O Film Structural, Morphological, and Electrical Property Dependencies on Substrate Type.

    Science.gov (United States)

    Ahn, Heejin; Um, Youngho

    2015-03-01

    We investigated the structural, morphological, and electrical properties of cuprous oxide (Cu2O) film dependency on substrate type. Thin films grown using RF magnetron sputtering were characterized by scanning electron microscopy, X-ray diffraction (XRD), and Hall effect measurements. Cu2O thin films were deposited onto sapphire (0001), Si (100), and MgO (110) substrates, and showed Cu2O single phase only, which was confirmed by XRD measurement. Relatively larger compressive strain existed in Cu2O film grown on sapphire and Si, while a smaller tensile strain appeared in Cu2O film grown on MgO. Cu2O thin film crystallite sizes showed a linear dependence on strain. Moreover, film carrier concentration and mobility increased with increasing strain, while resistivity decreased with decreasing strain. Cu2O film strain due to induced strain opens the possibility of controlling structural and electrical properties in device applications.

  13. Columnar structured FePt films epitaxially grown on large lattice mismatched intermediate layer

    Science.gov (United States)

    Dong, K. F.; Deng, J. Y.; Peng, Y. G.; Ju, G.; Chow, G. M.; Chen, J. S.

    2016-09-01

    The microstructure and magnetic properties of the FePt films grown on large mismatched ZrN (15.7%) intermediate layer were investigated. With using ZrN intermediate layer, FePt 10 nm films exhibited (001) texture except for some weaker FePt (110) texture. Good epitaxial relationships of FePt (001) //ZrN (001) //TiN (001) among FePt and ZrN/TiN were revealed from the transmission electron microscopy (TEM) results. As compared with TiN intermediate layer, although FePt-SiO2-C films grown on ZrN/TiN intermediate layer showed isotropic magnetic properties, the large interfacial energy and lattice mismatch between FePt and ZrN would lead to form columnar structural FePt films with smaller grain size and improved isolation. By doping ZrN into the TiN layer, solid solution of ZrTiN was formed and the lattice constant is increased comparing with TiN and decreased comparing with ZrN. Moreover, FePt-SiO2-C films grown on TiN 2 nm-20 vol.% ZrN/TiN 3 nm intermediate layer showed an improved perpendicular magnetic anisotropy. Simultaneously, columnar structure with smaller grain size retained.

  14. Structural characterization of InSb thin films grown by electrodeposition

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Joginder, E-mail: joginderchauhan82@gmail.com; Rajaram, P. [School of Studies in Physics, Jiwaji University, Gwalior-474011 (India)

    2015-06-24

    In the present work we have grown InSb thin films on brass substrates, using the electrodeposition technique. The electrochemical baths used in the growth were made up of aqueous solutions of InCl{sub 3} and SbCl{sub 3} mixed together in various proportions. The films grown were characterized by X-Ray diffraction (XRD), Scanning Electron Microscopy (SEM), and Energy Dispersive Analysis of X-rays (EDAX). Compositional studies show that stoichiometric InSb films can be prepared from a bath containing 0.05M InCl{sub 3} and 0.04M SbCl{sub 3}. XRD studies reveal that the films grown are polycrystalline having the zinc blende structure with (111) orientation. Crystallite size, dislocation density and strain were calculated using the XRD results. Optical transmission spectra were recorded using an FTIR spectrophotometer. The value of direct band gap was found to be around 0.20 eV for the thin films having the best stoichiometry.

  15. Do CVD grown graphene films have antibacterial activity on metallic substrates?

    CERN Document Server

    Dellieu, Louis; Reckinger, Nicolas; Didembourg, Christian; Letesson, Jean-Jacques; Sarrazin, Michael; Deparis, Olivier; Matroule, Jean-Yves; Colomer, Jean-François

    2014-01-01

    Accurate assessment of the antibacterial activity of graphene requires consideration of both the graphene fabrication method and, for supported films, the properties of the substrate. Large-area graphene films produced by chemical vapor deposition were grown directly on copper substrates or transferred on a gold substrate and their effect on the viability and proliferation of the Gram-positive bacteria Staphylococcus aureus and the Gram-negative bacteria Escherichia coli were assessed. The viability and the proliferation of both bacterial species were not affected when they were grown on a graphene film entirely covering the gold substrate, indicating that conductivity plays no role on bacterial viability and graphene has no antibacterial activity against S. aureus and E. coli. On the other hand, antibacterial activity was observed when graphene coated the copper substrates, resulting from the release of bactericidal cupric ions in inverse proportion to the graphene surface coverage.

  16. Annealing effects of sapphire substrate on properties of ZnO films grown by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Y.Z. [South China Normal University, School of Physics and Telecommunication Engineering, Guangzhou (China); Xu, J. [Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, P.O. Box 800-211, Shanghai (China)

    2007-09-15

    The annealing effects of sapphire substrates on the quality of epitaxial ZnO films grown by dc reactive magnetron sputtering were studied. The atomic steps formed on (0001) sapphire ({alpha}-Al{sub 2}O{sub 3}) substrates surface by annealing at high temperature were analyzed by atomic force microscopy. Their influence on the growth of ZnO films was examined by X-ray diffraction and photoluminescence measurements. Experimental results indicate that the film quality is strongly affected by annealing treatment of the sapphire substrate surface. The optimum annealing temperature of sapphire substrates for ZnO grown by magnetron sputtering is 1400 C for 1 h in air. (orig.)

  17. Mobility enhanced photoactivity in sol-gel grown epitaxial anatase TiO2 films.

    Science.gov (United States)

    Jung, Hyun Suk; Lee, Jung-Kun; Lee, Jaegab; Kang, Bo Soo; Jia, Quanxi; Nastasi, Michael; Noh, Jun Hong; Cho, Chin-Moo; Yoon, Sung Hoon

    2008-03-18

    Epitaxial anatase thin films were grown on single-crystal LaAlO3 substrates by a sol-gel process. The epitaxial relationship between TiO2 and LaAlO3 was found to be [100]TiO2||[100]LaAlO3 and (001)TiO2||(001)LaAlO3 based on X-ray diffraction and a high-resolution transmission electron microscopy. The epitaxial anatase films show significantly improved photocatalytic properties, compared with polycrystalline anatase film on fused silica substrate. The increase in the photocatalytic activity of epitaxial anatase films is explained by enhanced charge carrier mobility, which is traced to the decreased grain boundary density in the epitaxial anatase film.

  18. Nanostructured Diamond-Like Carbon Films Grown by Off-Axis Pulsed Laser Deposition

    Directory of Open Access Journals (Sweden)

    Seong Shan Yap

    2015-01-01

    Full Text Available Nanostructured diamond-like carbon (DLC films instead of the ultrasmooth film were obtained by pulsed laser ablation of pyrolytic graphite. Deposition was performed at room temperature in vacuum with substrates placed at off-axis position. The configuration utilized high density plasma plume arriving at low effective angle for the formation of nanostructured DLC. Nanostructures with maximum size of 50 nm were deposited as compared to the ultrasmooth DLC films obtained in a conventional deposition. The Raman spectra of the films confirmed that the films were diamond-like/amorphous in nature. Although grown at an angle, ion energy of >35 eV was obtained at the off-axis position. This was proposed to be responsible for subplantation growth of sp3 hybridized carbon. The condensation of energetic clusters and oblique angle deposition correspondingly gave rise to the formation of nanostructured DLC in this study.

  19. Structural and nonlinear optical properties of as-grown and annealed metallophthalocyanine thin films

    Energy Technology Data Exchange (ETDEWEB)

    Zawadzka, A., E-mail: azawa@fizyka.umk.pl [Institute of Physics, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus University, Grudziadzka 5, 87-100 Torun (Poland); Płóciennik, P.; Strzelecki, J. [Institute of Physics, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus University, Grudziadzka 5, 87-100 Torun (Poland); Pranaitis, M.; Dabos-Seignon, S.; Sahraoui, B. [LUNAM Université, Université d' Angers, CNRS UMR 6200, Laboratoire MOLTECH-Anjou, 2 bd Lavoisier, 49045 Angers cedex (France)

    2013-10-31

    The paper presents the Third Harmonic Generation investigation of four metallophtalocyanine (MPc, M = Cu, Co, Mg and Zn) thin films. The investigated films were fabricated by Physical Vapor Deposition in high vacuum onto quartz substrates. MPc thin films were annealed after fabrication in ambient atmosphere for 12 h at the temperature equal to 150 °C or 250 °C. The Third Harmonic Generation spectra were measured to investigate the nonlinear optical properties and their dependence on the structure of the thin film after the annealing process. This approach allowed us to determine the electronic contribution of the third-order nonlinear optical susceptibility χ{sup <3>}{sub elec} of these MPc films and to investigate two theoretical models for explanation of the observed results. We find that the annealing process significantly changes the optical and structural properties of MPc thin films. - Highlights: • Metallophtalocyanine thin films were grown by Physical Vapor Deposition technique. • MPcs thin films were undergone an annealing process in ambient atmosphere. • Third Harmonic spectra were measured to investigate nonlinear optical properties. • The third order nonlinear optical susceptibility χ{sup <3>}{sub elec} was determined. • We report changing both nonlinear optical and structural properties of thin films.

  20. Superconducting YBa 2Cu 3O 7- δ thin film grown on metallic film evaporated on MgO

    Science.gov (United States)

    Verdyan, A.; Azoulay, J.; Lapsker, I.

    2001-03-01

    At present it is commonly accepted that thin film formation of YBa 2Cu 3O 7- δ (YBCO) on conducting substrate is one of the keys to further development of advanced devices in the microelectronic and other applications. We have grown YBCO thin films by resistive evaporation technique on MgO coated with metallic layers (Ni or Ag). A simple inexpensive vacuum system equipped with resistively heated boats for metal and precursor mixture of yttrium, copper and barium fluoride powders was used. X-ray diffraction (XRD) and scanning electron microscopy techniques were used for texture, morphology and surface analyses respectively. Electrical and magnetical properties were determined by a standard dc four-probe method. The way of heating process is shown to be critical parameter in the film quality. The physical and electrical properties of the YBCO films are discussed in light of the fact that XRD measurements done on the metallic buffer layers have revealed a multicrystalline structure.

  1. Microstructure, optical and electrical properties of Al-doped ZnO films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Su, Jianfeng, E-mail: sujianfengvy@gmail.com [Department of Mathematics and Physics, Luoyang Institute of Science and Technology, Luoyang 471023 (China); Tang, Chunjuan; Niu, Qiang; Zang, Chunhe; Zhang, Yongsheng [Department of Mathematics and Physics, Luoyang Institute of Science and Technology, Luoyang 471023 (China); Fu, Zhuxi [Department of Physics, University of Science and Technology of China, Hefei 230026 (China)

    2012-09-01

    Highlights: Black-Right-Pointing-Pointer Al-doped ZnO films were grown on quartz substrates by MOCVD. Black-Right-Pointing-Pointer The preferred orientation of ZnO films decreased with the increase of Al content. Black-Right-Pointing-Pointer Decomposition products of TMA bringing down the surface activity of ZnO grains. Black-Right-Pointing-Pointer UV emission peak initially red-shifted and then blue-shifted as increasing Al content. Black-Right-Pointing-Pointer Low electrical resistivity of Al-doped ZnO films was obtained. - Abstract: Al-doped ZnO films were grown on quartz substrates by MOCVD. A systematical and detailed study about the effect of Al content on structural, optical and electrical properties were discussed. XRD measurements revealed that the preferred orientation of ZnO films decreased with the increase of Al content. AFM images indicated that the TMA molecules or their decomposition products bringing down the surface activity of ZnO grains, and so grain growth is inhibited. By the band tail states and the quantum confinement effect, the UV emission peak initially red-shifted and then blue-shifted. All Al-doped samples demonstrated more than 80% of the optical transparency in the visible region. Low electrical resistivity of Al-doped ZnO films was obtained. However, due to defects and grain boundary scattering which caused by Al doping, the hall mobility is increased initially and then decreased.

  2. Construção e caracterização de células solares de filmes finos de CdS e CdTe

    OpenAIRE

    Morales Morales, Oswaldo [UNESP

    2012-01-01

    Neste trabalho, o objeto de estudo foi células Solares CdS/CdTe. Estas células usam o filme de sulfeto de cádmio (CdS) como semicondutor do tipo n e o filme de telureto de cádmio (CdTe) como semicondutor do tipo p. O recorde mundial, alcançado no laboratório, para estas células é 16,5% de eficiência. Nos Laboratórios do Departamento de Física e Química de Unesp - Ilha Solteira, este trabalho é pioneiro na fabricação de Células Solares de CdS/CdTe. Para realizar este trabalho foi necessário me...

  3. Biocidal Silver and Silver/Titania Composite Films Grown by Chemical Vapour Deposition

    Directory of Open Access Journals (Sweden)

    D. W. Sheel

    2008-01-01

    Full Text Available This paper describes the growth and testing of highly active biocidal films based on photocatalytically active films of TiO2, grown by thermal CVD, functionally and structurally modified by deposition of nanostructured silver via a novel flame assisted combination CVD process. The resulting composite films are shown to be highly durable, highly photocatalytically active and are also shown to possess strong antibacterial behaviour. The deposition control, arising from the described approach, offers the potential to control the film nanostructure, which is proposed to be crucial in determining the photo and bioactivity of the combined film structure, and the transparency of the composite films. Furthermore, we show that the resultant films are active to a range of organisms, including Gram-negative and Gram-positive bacteria, and viruses. The very high-biocidal activity is above that expected from the concentrations of silver present, and this is discussed in terms of nanostructure of the titania/silver surface. These properties are especially significant when combined with the well-known durability of CVD deposited thin films, offering new opportunities for enhanced application in areas where biocidal surface functionality is sought.

  4. High-quality AlN films grown on chemical vapor-deposited graphene films

    Directory of Open Access Journals (Sweden)

    Chen Bin-Hao

    2016-01-01

    Full Text Available We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  5. Structural and morphological characterizations of ZnO films grown on GaAs substrates by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Agouram, S.; Zuniga Perez, J.; Munoz-Sanjose, V. [Universitat de Valencia, Departamento de Fisica Aplicada y Electromagnetismo, Burjassot (Spain)

    2007-07-15

    ZnO films were grown on GaAs(100), GaAs(111)A and GaAs(111)B substrates by metal organic chemical vapour deposition (MOCVD). Diethylzinc (DEZn) and tertiarybutanol (t-butanol) were used as Zn and O precursors, respectively. The influence of the growth temperature and GaAs substrate orientation on the crystalline orientation and morphology of the ZnO grown films has been analysed. Crystallinity of grown films was studied by X-ray diffraction (XRD); thickness and morphology of ZnO films were investigated by scanning electron microscopy (SEM). SEM results reveal significant differences between morphologies depending on growth temperature but not significant differences were detected on the texture of grown films. (orig.)

  6. Engineering of Wet Chemically Grown Nanostructured Zinc Oxide Thin Film by High Electronic Excitation

    Science.gov (United States)

    Birajadar, Ravikiran B.; Ghosh, Arindam A.; Joshi, Rajesh A.; Taur, Vidya S.; Shaikh, S. U.; Ghule, Anil V.; Sharma, Ramphal

    2011-07-01

    Thin films of ZnO are synthesized on ITO substrate using successive ionic layer adsorption and reaction (SILAR) technique. The as-grown thin films were annealed at 250 °C (pristine) in vacuum atmosphere (10-2 Torr) for 1 h and further irradiated using 120 MeV Au9+ ions with different fluence 3×1012 and 5×1012 ions/cm2. These pristine and irradiated samples were studied for structural and optoelectronic properties. XRD study reveals better crystalline quality of film at 3×1012 ions/cm2 fluence. On the other hand, electrical resistivity of the films decreases from 13.44 Ω-cm to 3.74 Ω-cm with increase in irradiation fluence. Also it appears that irradiation does not affect absorption edge.

  7. Morphology of superconducting FeSe thin films grown by MBE and RF-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kronenberg, Alexander; Venzmer, Eike; Haaf, Sebastian ten; Jourdan, Martin [Institut fuer Physik, Johannes Gutenberg Universitaet Mainz (Germany); Maletz, Janek [Institut fuer Physik, Johannes Gutenberg Universitaet Mainz (Germany); Leibniz-Institut fuer Festkoerper- und Werkstoffforschung, Dresden (Germany)

    2013-07-01

    Tunneling spectroscopy on planar junctions is the most direct approach for the investigation of superconducting coupling mechanisms. However, it requires smooth interfaces at the tunneling barrier. The morphology of superconducting thin films of FeSe grown by MBE and co-sputtering (RF) from an iron and a selenium target are compared. MBE deposited films show an extreme sensitivity to stoichiometry, deposition temperature and choice of substrate. These films exhibit macroscopic crevices and a pronounced roughness, rendering the preparation of tunneling junctions impossible. However, sputter deposited epitaxial FeSe thin films clearly show a more favorable morphology. Optical microscopy, AFM and SEM demonstrate a smooth surface with segregations which are eliminated by proper choice of the deposition parameters.

  8. On detection of the Fermi edge in in situ grown thin films of high- Tc oxides

    Science.gov (United States)

    Abrecht, M.; Ariosa, D.; Saleh, S. A.; Rast, S.; Margaritondo, G.; Onellion, M.; Pavuna, D.

    2001-11-01

    We discuss our systematic series of experiments on the photoelectric detection of the Fermi edge using a cylindrical mirror analyser on films of high- Tc oxides, grown in situ by pulsed laser ablation. The Fermi edge (comparable to the edge of the reference Ag) is very easily observed even in the two-phase BSCCO-2212 film that exhibits onsets of superconducting transitions, at 85 and 45 K. In contrast, the Fermi edge is weaker and more difficult to observe even in the state-of-the-art, highly epitaxial, monophase YBa 2Cu 3O 7- y (YBCO) and NdBa 2Cu 3O 7- y (NBCO-123) films (both with Tc=92 K). So far we could not detect the Fermi edge in the films of the double-`chain' YBCO-124.

  9. Tunability of the superconductivity of tungsten films grown by focused-ion-beam direct writing

    Science.gov (United States)

    Li, Wuxia; Fenton, J. C.; Wang, Yiqian; McComb, D. W.; Warburton, P. A.

    2008-11-01

    We have grown tungsten-containing films by focused-ion-beam (FIB)-induced chemical vapor deposition. The films lie close to the metal-insulator transition with an electrical conductivity which changes by less than 5% between room temperature and 7 K. The superconducting transition temperature Tc of the films can be controlled between 5.0 and 6.2 K by varying the ion-beam deposition current. The Tc can be correlated with how far the films are from the metal-insulator transition, showing a nonmonotonic dependence, which is well described by the heuristic model of [Osofsky et al., Phys. Rev. Lett. 87, 197004 (2001)]. Our results suggest that FIB direct-writing of W composites might be a potential approach to fabricate mask-free superconducting devices as well as to explore the role of reduced dimensionality on superconductivity.

  10. Temperature dependent photoluminescence characteristics of nanocrystalline ZnO films grown by sol-gel technique

    Energy Technology Data Exchange (ETDEWEB)

    Mandal, S.; Goswami, M.L.N.; Das, K.; Dhar, A. [Department of Physics and Meteorology, IIT Kharagpur 721 302 (India); Ray, S.K. [Department of Physics and Meteorology, IIT Kharagpur 721 302 (India)], E-mail: physkr@phy.iitkgp.ernet.in

    2008-10-01

    The structural as well as optical properties of nanocrystalline ZnO films, with hexagonal shaped particles of size 30-35 nm grown on p-Si (100) substrates by sol-gel technique, are investigated. Selected-area electron diffraction and X-ray diffraction patterns of annealed films reveal the formation of wurtzite structure. The mechanism of ultraviolet (UV) and green emission from ZnO thin films, post-annealed at various temperatures, is investigated using photoluminescence spectra. The oxygen content in annealed ZnO films plays an important role to suppress the green band emission. Temperature dependent photoluminescence spectra are recorded in the temperature range 10 K to 300 K to investigate different excitonic peaks in the UV-region.

  11. Physical properties of Bi doped CdTe thin films grown by the CSVT method

    Energy Technology Data Exchange (ETDEWEB)

    Vigil-Galan, O.; Sastre-Hernandez, J.; Cruz-Gandarilla, F.; Aguilar-Hernandez, J.; Contreras-Puente, G.; Tufino-Velazquez, M. [Escuela Superior de Fisica y Matematicas, Instituto Politecnico Nacional, 07738 Mexico D. F. (Mexico); Marin, E. [Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Instituto Politecnico Nacional, 11500 Mexico, D. F. (Mexico); Saucedo, E.; Ruiz, C.M.; Bermudez, V. [Departamento de Fisica de Materiales, Universidad Autonoma de Madrid, 28049 Madrid (Spain)

    2006-09-22

    A study of the physical properties of CdTe thin films doped with Bi is presented. CdTe:Bi thin films were deposited by the close space vapor transport (CSVT) technique using powdered CdTe:Bi crystals grown by the vertical Bridgman method. CdTe:Bi crystals were obtained with nominal Bi doping concentrations varying in the 1x10{sup 17}-8x10{sup 18}cm{sup -3} range. The physical properties of CdTe:Bi thin films were studied performing photoluminescence, X-ray, SEM, photoacoustic spectroscopy and resistivity measurements. We observed a decrease of the resistivity values of CdTe:Bi films with the Bi content as low as 6x10{sup 5}{omega}-cm for Bi concentrations of 8x10{sup 18}cm{sup -3}. These are meaningful results for CdTe-based solar cells. (author)

  12. N-Type Conductive Ultrananocrystalline Diamond Films Grown by Hot Filament CVD

    Directory of Open Access Journals (Sweden)

    Michael Mertens

    2015-01-01

    Full Text Available We present the synthesis of ultrananocrystalline diamond (UNCD films by application of hot filament chemical vapor deposition (HFCVD. We furthermore studied the different morphological, structural, and electrical properties. The grown films are fine grained with grain sizes between 4 and 7 nm. The UNCD films exhibit different electrical conductivities, dependent on grain boundary structure. We present different contact metallizations exhibiting ohmic contact behavior and good adhesion to the UNCD surface. The temperature dependence of the electrical conductivity is presented between −200 and 900°C. We furthermore present spectroscopic investigations of the films, supporting that the origin of the conductivity is the structure and volume of the grain boundary.

  13. Variable range hopping crossover and magnetotransport in PLD grown Sb doped ZnO thin film

    Science.gov (United States)

    Mukherjee, Joynarayan; Mannam, Ramanjaneyulu; Ramachandra Rao, M. S.

    2017-04-01

    We report on the variable range hopping (VRH) crossover in the electrical transport of Sb doped ZnO (SZO) thin film. Structural, chemical, electrical and magnetotransport properties were carried out on SZO thin film grown by pulsed laser deposition. X-photoelectron spectroscopy study confirms the presence of both Sb3+(33%) and Sb5+(67%) states. Sb doped ZnO thin film shows n-type behavior which is attributed to the formation of SbZn and/or SbZn–VZn defect complex. Temperature dependent resistivity measurement showed that in a low temperature regime (doped ZnO thin films is explained by the Khosla and Fischer model.

  14. Electrical transport and magnetic properties of epitaxial LSMO films grown on STO substrates

    Science.gov (United States)

    Yuan, Wei; Zhao, Yuelei; Su, Tang; Song, Qi; Han, Wei; Shi, Jing

    2015-03-01

    La0.7Sr0.3MnO3 (LSMO) is a very attractive material for spintronics due to its half-metallic ferromagnetic properties. The LSMO films are epitaxially grown on STO (100) substrates using pulsed laser deposition. The effects of substrate temperature, laser power, oxygen pressure, and annealing on the LSMO growth are systematically investigated by the reflection high energy electron diffraction and atomic force microscopy. Under the optimized growth condition, we have achieved atomically flat LSMO thin films with a wide terrace width of more than 5 micro-meters. The electrical transport properties of LSMO thin films of various thicknesses ranging from 8 to 20 monolayers are studied by measuring the resistivity as a function of temperature. We find that the growth condition plays an important role in the critical film thickness for the metal-insulator transition and the Curie temperature. The Ministry of Science and Technology of China.

  15. Chemical synthesis of CdS onto TiO2 nanorods for quantum dot sensitized solar cells

    Science.gov (United States)

    Pawar, Sachin A.; Patil, Dipali S.; Lokhande, Abhishek C.; Gang, Myeng Gil; Shin, Jae Cheol; Patil, Pramod S.; Kim, Jin Hyeok

    2016-08-01

    A quantum dot sensitized solar cell (QDSSC) is fabricated using hydrothermally grown TiO2 nanorods and successive ionic layer adsorption and reaction (SILAR) deposited CdS. Surface morphology of the TiO2 films coated with different SILAR cycles of CdS is examined by Scanning Electron Microscopy which revealed aggregated CdS QDs coverage grow on increasing onto the TiO2 nanorods with respect to cycle number. Under AM 1.5G illumination, we found the TiO2/CdS QDSSC photoelectrode shows a power conversion efficiency of 1.75%, in an aqueous polysulfide electrolyte with short-circuit photocurrent density of 4.04 mA/cm2 which is higher than that of a bare TiO2 nanorods array.

  16. RBS study of in situ grown BiSrCaCuO films

    Energy Technology Data Exchange (ETDEWEB)

    Ranno, L.; Perriere, J.; Enard, J.P.; Kerherve, F.; Laurent, A.; Casero, R.P. (Paris-6 Univ., 75 (France). Lab. de Physique des Solides)

    1992-07-01

    BiSrCaCuO thin films have been grown in situ on MgO single crystals by pulsed laser deposition under 0.1 mbar oxygen pressure, the substrate temperature being around 700{sup o}C. These films are nearly pure 2212 phase, highly textured with a full c-axis orientation, and Rutherford backscattering spectrometry (RBS) in channeling geometry has been used to obtain precise information on their crystallinity. Although the X{sub min} values were found higher (about 35%) than those measured on bulk single crystals, they show partial epitaxy of the films, which was not observed with post annealed films. The comparison of backscattering yield in random and aligned orientations evidences the fact that all the cationic elements behave in a similar way in the channeling experiments, while differences are observed for the oxygen species according to their precise location in the network. These in situ grown films were found very sensitive to the ion irradiation, and showed a large dechanneling effect with increasing ion doses. (author).

  17. Transmission electron microscopy study of as-grown MgB{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Harada, Y. [Iwate Industry Promotion Center, 3-35-2 Iioka-shinden, Morioka 020-0852 (Japan)]. E-mail: yharada@luck.ocn.ne.jp; Iriuda, H. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Kuroha, M. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Oba, T. [Faculty of Materials science and Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Seki, M. [Faculty of Materials science and Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Nakanishi, Y. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Echigoya, J. [Faculty of Materials science and Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Yoshizawa, M. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan)

    2006-10-01

    The intermetallic superconductor magnesium diboride (MgB{sub 2}) is a promising candidate for use in superconducting electronic devices because of its high transition temperature (T{sub c}). These applications require the development of a high-quality film fabrication process. We have previously reported the growth of MgB{sub 2} films deposited on MgO (1 0 0), SrTiO{sub 3} (1 0 0) and Al{sub 2}O{sub 3} (0 0 0 1) substrate using a co-evaporation method and molecular beam epitaxy (MBE) apparatus. In this paper, we will report the correlation between structural properties and physical properties of as-grown MgB{sub 2} films deposited on MgO (1 0 0), ZnO (0 0 0 1), and Si (1 1 1) substrate. The films' basal properties have been confirmed by reflection high-energy electron diffraction (RHEED), X-ray diffraction (XRD), resistivity measurements and SQUID magnetometry. The details of the interfacial structure were studied by transmission electron microscopy (TEM). We will then discuss the most important parameters for fabricating high quality as-grown MgB{sub 2} films and junctions.

  18. Yttria and ceria doped zirconia thin films grown by pulsed laser deposition

    Directory of Open Access Journals (Sweden)

    F. Saporiti

    2013-06-01

    Full Text Available The Yttria stabilized Zirconia (YSZ is a standard electrolyte for solid oxide fuel cells (SOFCs, which are potential candidates for next generation portable and mobile power sources. YSZ electrolyte thin films having a cubic single phase allow reducing the SOFC operating temperature without diminishing the electrochemical power density. Films of 8 mol% Yttria stabilized Zirconia (8YSZ and films with addition of 4 weight% Ceria (8YSZ + 4CeO2 were grown by pulsed laser deposition (PLD technique using 8YSZ and 8YSZ + 4CeO2 targets and a Nd-YAG laser (355 nm. Films have been deposited on Soda-Calcia-Silica glass and Si(100 substrates at room temperature. The morphology and structural characteristics of the samples have been studied by means of X-ray diffraction and scanning electron microscopy. Films of a cubic-YSZ single phase with thickness in the range of 1-3 µm were grown on different substrates.

  19. YBa2Cu3O7 films grown by metal cosputtering

    Science.gov (United States)

    Steinberg, Richard N.; McCambridge, James D.; Prober, Daniel E.; Guenin, Bruce M.

    1992-04-01

    Superconducting YBa2Cu3O7 films have been grown in situ by simultaneously sputtering from Y, BaCu, and Cu targets. One advantage of such metal cosputtering is the higher deposition rate compared to oxide target sputtering. Another advantage is the ability to control the individual element rates to vary composition or to substitute for any of the metals without interrupting film growth and without making additional composite targets. To prevent film damage due to oxygen ion bombardment during film growth which was observed when the sputter guns faced the substrate (on-axis sputtering), an off-axis geometry was used. One disadvantage we found with in situ metal cosputtering was that reproducibility of stoichiometries was difficult because of the presence of oxygen at the targets. To minimize the oxygen partial pressure at the targets during sputtering, the chamber was differentially pumped. Films grown in the off-axis geometry with a substrate temperature near 700 °C, a chamber pressure of 7.5 mT, and an O2:Ar flow ratio of 1:50 had zero resistance at 85 K. Results for on-axis, composite target magnetron sputtering with a high-strength magnet are also presented. These results are not promising.

  20. Yttria and ceria doped zirconia thin films grown by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Saporiti, F.; Juarez, R. E., E-mail: cididi@fi.uba.ar [Grupo de Materiales Avanzados, Facultad de Ingenieria, Universidad de Buenos Aires (Argentina); Audebert, F. [Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET) (Argentina); Boudard, M. [Laboratoire des Materiaux et du Genie Physique (CNRS), Grenoble (France)

    2013-11-01

    The Yttria stabilized Zirconia (YSZ) is a standard electrolyte for solid oxide fuel cells (SOFCs), which are potential candidates for next generation portable and mobile power sources. YSZ electrolyte thin films having a cubic single phase allow reducing the SOFC operating temperature without diminishing the electrochemical power density. Films of 8 mol% Yttria stabilized Zirconia (8YSZ) and films with addition of 4 weight% Ceria (8YSZ + 4CeO{sub 2}) were grown by pulsed laser deposition (PLD) technique using 8YSZ and 8YSZ + 4CeO{sub 2} targets and a Nd-YAG laser (355 nm). Films have been deposited on Soda-Calcia-Silica glass and Si(100) substrates at room temperature. The morphology and structural characteristics of the samples have been studied by means of X-ray diffraction and scanning electron microscopy. Films of a cubic-YSZ single phase with thickness in the range of 1-3 Micro-Sign m were grown on different substrates (author)

  1. Group III-nitride thin films grown using MBE and bismuth

    Science.gov (United States)

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  2. Thermally deposited Ag-doped CdS thin film transistors with high-k rare-earth oxide Nd{sub 2}O{sub 3} as gate dielectric

    Energy Technology Data Exchange (ETDEWEB)

    Gogoi, P., E-mail: paragjyoti_g@rediffmail.com [Sibsagar College, Material Science Laboratory, Department of Physics (India)

    2013-03-15

    The performance of thermally deposited CdS thin film transistors doped with Ag has been reported. Ag-doped CdS thin films have been prepared using chemical method. High dielectric constant rare earth oxide Nd{sub 2}O{sub 3} has been used as gate insulator. The thin film trasistors are fabricated in coplanar electrode structure on ultrasonically cleaned glass substrates with a channel length of 50 {mu}m. The thin film transistors exhibit a high mobility of 4.3 cm{sup 2} V{sup -1} s{sup -1} and low threshold voltage of 1 V. The ON-OFF ratio of the thin film transistors is found as 10{sup 5}. The TFTs also exhibit good transconductance and gain band-width product of 1.15 Multiplication-Sign 10{sup -3} mho and 71 kHz respectively.

  3. [Raman spectra studies of MBE-grown n-GaAs/SI-GaAs films].

    Science.gov (United States)

    Wang, Bin; Xu, Xiao-xuan; Qin, Zhe; Song, Ning; Zhang, Cun-zhou

    2008-09-01

    n-GaAs films doped with Si were grown by MBE on semi-insulated GaAs (100) substrates. The films with different doping concents were characterized by Raman spectra at room temperature. It is obviously that the Raman peaks shifted. Some peaks were enhanced and some were weakened. This is attributed to the fact that the higher the doping contents, the highertge lattice mismatch. And the lattice misfit induced the imperfection in epitaxy layers. This experimental result coincides with the theory.

  4. Surface organization of homoepitaxial InP films grown by metalorganic vapor-phase epitaxy

    OpenAIRE

    Gocalinska, A.; Manganaro, M.; Vvedensky, D. D.; Pelucchi, E.

    2012-01-01

    We present a systematic study of the morphology of homoepitaxial InP films grown by metalorganic vapor-phase epitaxy which are imaged with ex situ atomic force microscopy. These films show a dramatic range of different surface morphologies as a function of the growth conditions and substrate (growth temperature, V/III ratio, and miscut angle < 0.6deg and orientation toward A or B sites), ranging from stable step flow to previously unreported strong step bunching, over 10 nm in height. These o...

  5. Non-destructive characterization of films grown on Zircaloy-2 by annealing in air

    Energy Technology Data Exchange (ETDEWEB)

    McNatt, J.S.; Shepard, M.J.; Farkas, N.; Morgan, J.M.; Ramsier, R.D. [Departments of Physics, Chemistry, and Chemical Engineering, University of Akron, Akron, OH (United States)]. E-mail: rex@uakron.edu

    2002-08-07

    Zircaloy-2 is often used in engineering applications because of its corrosion resistance; a property attributable to a protective oxide film that grows on its surface. Variable angle infrared (IR) reflection spectroscopy and atomic force microscopy are used to determine the thickness and roughness of such films grown thermally on Zircaloy-2 surfaces in air. We find cubic growth kinetics in the temperature range 500-600 deg. C with an apparent activation energy of 227 kJ mol{sup -1}. We also demonstrate how an increase in microscopic surface roughness at higher temperatures correlates with a loss of oxide homogeneity as sampled by the IR method. (author)

  6. Solution-Grown Monocrystalline Hybrid Perovskite Films for Hole-Transporter-Free Solar Cells

    KAUST Repository

    Peng, Wei

    2016-03-02

    High-quality perovskite monocrystalline films are successfully grown through cavitation-triggered asymmetric crystallization. These films enable a simple cell structure, ITO/CH3NH3PbBr3/Au, with near 100% internal quantum efficiency, promising power conversion efficiencies (PCEs) >5%, and superior stability for prototype cells. Furthermore, the monocrystalline devices using a hole-transporter-free structure yield PCEs ≈6.5%, the highest among other similar-structured CH3NH3PbBr3 solar cells to date.

  7. Irradiation induced improvement in crystallinity of epitaxially grown Ag thin films on Si substrates

    Energy Technology Data Exchange (ETDEWEB)

    Takahiro, Katsumi; Nagata, Shinji; Yamaguchi, Sadae [Tohoku Univ., Sendai (Japan). Inst. for Materials Research

    1997-03-01

    We report the improvement in crystallinity of epitaxially grown Ag films on Si(100) substrates with ion irradiation. The irradiation of 0.5 MeV Si ions to 2x10{sup 16}/cm{sup 2} at 200degC, for example, reduces the channeling minimum yield from 60% to 6% at Ag surface. The improvement originates from the decrease of mosaic spread in the Ag thin film. In our experiments, ion energy, ion species and irradiation temperature have been varied. The better crystallinity is obtained as the higher concentration of defect is generated. The mechanism involved in the irradiation induced improvement is discussed. (author)

  8. Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD

    Institute of Scientific and Technical Information of China (English)

    Xu Zhihao; Zhang Jincheng; Duan Huantao; Zhang Zhongfen; Zhu Qingwei; Xu Hao; Hao Yue

    2009-01-01

    The stresses, structural and electrical properties of n-type Si-doped GaN films grown by metalorganic chemical vapor deposition (MOCVD) are systemically studied. It is suggested that the main stress relaxation is induced by bending dislocations in low doping samples. But for higher doping samples, as the Si doping concentration increases, the in-plane stresses in the grown films are quickly relaxed due to the rapid increase of the edge dislocation densities. Hall effect measurements reveal that the carrier mobility first increases rapidly and then decreases with increasing Si doping concentration. This phenomenon is attributed to the interaction between various scattering process. It is suggested that the dominant scattering process is defect scattering for low doping samples and ionized impurity scattering for high doping samples.

  9. Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Xu Zhihao; Zhang Jincheng; Duan Huantao; Zhang Zhongfen; Zhu Qingwei; Xu Hao; Hao Yue, E-mail: forman1115@163.co [Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi' an 710071 (China)

    2009-12-15

    The stresses, structural and electrical properties of n-type Si-doped GaN films grown by metalorganic chemical vapor deposition (MOCVD) are systemically studied. It is suggested that the main stress relaxation is induced by bending dislocations in low doping samples. But for higher doping samples, as the Si doping concentration increases, the in-plane stresses in the grown films are quickly relaxed due to the rapid increase of the edge dislocation densities. Hall effect measurements reveal that the carrier mobility first increases rapidly and then decreases with increasing Si doping concentration. This phenomenon is attributed to the interaction between various scattering process. It is suggested that the dominant scattering process is defect scattering for low doping samples and ionized impurity scattering for high doping samples. (semiconductor materials)

  10. Roughness of CdTe thin films grown on glass by hot wall epitaxy.

    Science.gov (United States)

    Leal, F F; Ferreira, S O; Menezes-Sobrinho, I L; Faria, T E

    2005-01-12

    Cadmium telluride films were grown on glass substrates using the hot wall epitaxy (HWE) technique. The samples were polycrystalline with a preferential (111) orientation. Scanning electron micrographs reveal a grain size between 0.1 and 0.5 µm. The surface morphology of the samples was studied by measuring the roughness profile using a stylus profiler. The roughness as a function of growth time and scale size were investigated to determine the growth and roughness exponents, β and α, respectively. From the results we can conclude that the growth surface has a self-affine character with a roughness exponent α equal to 0.69 ± 0.03 and almost independent of growth time. The growth exponent β was equal to 0.38 ± 0.06. These values agree with that determined previously for CdTe(111) films grown on GaAs(100).

  11. The effect of processing conditions on the structural morphology and physical properties of ZnO and CdS thin films produced via sol-gel synthesis and chemical bath deposition techniques

    Science.gov (United States)

    Salam, Shahzad; Islam, Mohammad; Alam, Mahboob; Akram, Aftab; Ikram, Mujtaba; Mahmood, Asif; Khan, Majid; Mujahid, Mohammad

    2011-12-01

    Cadmium sulfide (CdS) and zinc oxide (ZnO) are used in thin film solar cells as buffer layer and transparent conducting oxide, respectively. The effect of annealing conditions on the morphology and physical properties of CdS and ZnO films prepared using chemical bath deposition and sol-gel synthesis techniques, respectively, was investigated. CdS films obtained from the chemical bath deposition (CBD) process were found to be polycrystalline with dense granular morphology. Electrical characterization of the films annealed at 400 °C for 10 min yielded values of 2.2×10-3 Ω cm and 8.3×1012 cm-3 for resistivity and carrier concentration, respectively. Scanning electron microscopy (SEM) and x-ray diffraction (XRD) studies of intrinsic zinc oxide (i-ZnO) films revealed flake-like morphology and transformation of the as-deposited amorphous structure into a hexagonal wurtzite crystal structure upon annealing at 500 °C for 2 h. Optical and electrical characterization results showed that such films had ~80% transmittance and resistivity values as low as 6.4×102 Ω cm. These films are being explored for fabrication and testing of copper-indium-gallium-(di)selenide (CIGS) thin film solar cells obtained from simple, cost-effective, solution-based synthesis routes.

  12. Effect of annealing temperature on the optical spectra of CdS thin films deposited at low solution concentrations by Chemical Bath Deposition (CBD) Technique.

    Science.gov (United States)

    Rizwan, Zahid; Zakaria, Azmi; Mohd Ghazali, Mohd Sabri; Jafari, Atefeh; Din, Fasih Ud; Zamiri, Reza

    2011-02-22

    Two different concentrations of CdCl(2) and (NH(2))(2)CS were used to prepare CdS thin films, to be deposited on glass substrate by chemical bath deposition (CBD) technique. CdCl(2) (0.000312 M and 0.000625 M) was employed as a source of Cd(2+) while (NH(2))(2)CS (0.00125 M and 0.000625 M) for S(2-) at a constant bath temperature of 70 °C. Adhesion of the deposited films was found to be very good for all the solution concentrations of both reagents. The films were air-annealed at a temperature between 200 °C to 360 °C for one hour. The minimum thickness was observed to be 33.6 nm for film annealed at 320 °C. XRD analyses reveal that the films were cubic along with peaks of hexagonal phase for all film samples. The crystallite size of the films decreased from 41.4 nm to 7.4 nm with the increase of annealing temperature for the CdCl(2) (0.000312 M). Optical energy band gap (E(g)), Urbach energy (E(u)) and absorption coefficient (α) have been calculated from the transmission spectral data. These parameters have been discussed as a function of annealing temperature and solution concentration. The best transmission (about 97%) was obtained for the air-annealed films at higher temperature at CdCl(2) (0.000312 M).

  13. Photoinduced Br Desorption from CsBr Thin Films Grown on Cu(100)

    Energy Technology Data Exchange (ETDEWEB)

    Halliday, Matthew T.; Joly, Alan G.; Hess, Wayne P.; Shluger, AL

    2015-10-22

    Thin films of CsBr deposited onto metals such as copper are potential photocathode materials for light sources and other applications. We investigate desorption dynamics of Br atoms from CsBr films grown on insulator (KBr, LiF) and metal (Cu) substrates induced by sub-bandgap 6.4 eV laser pulses. The experimental results demonstrate that the peak kinetic energy of Br atoms desorbed from CsBr/Cu films is much lower than that for the hyperthermal desorption from CsBr/LiF films. Kelvin probe measurements indicate negative charge at the surface following Br desorption from CsBr/Cu films. Our ab initio calculations of excitons at CsBr surfaces demonstrate that this behavior can be explained by an exciton model of desorption including electron trapping at the CsBr surface. Trapped negative charges reduce the energy of surface excitons available for Br desorption. We examine the electron-trapping characteristics of low-coordinated sites at the surface, in particular, divacancies and kink sites. We also provide a model of cation desorption caused by Franck-Hertz excitation of F centers at the surface in the course of irradiation of CsBr/Cu films. These results provide new insights into the mechanisms of photoinduced structural evolution of alkali halide films on metal substrates and activation of metal photocathodes coated with CsBr.

  14. Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Sammelselg, Väino, E-mail: vaino.sammelselg@ut.ee [Institute of Physics, University of Tartu, Riia 142, 51014 Tartu (Estonia); Institute of Chemistry, University of Tartu, Ravila 14a, 50411 Tartu (Estonia); Netšipailo, Ivan; Aidla, Aleks; Tarre, Aivar; Aarik, Lauri; Asari, Jelena; Ritslaid, Peeter; Aarik, Jaan [Institute of Physics, University of Tartu, Riia 142, 51014 Tartu (Estonia)

    2013-09-02

    Etching rate of technologically important metal oxide thin films in hot sulphuric acid was investigated. The films of Al-, Ti-, Cr-, and Ta-oxides studied were grown by atomic layer deposition (ALD) method on silicon substrates from different precursors in large ranges of growth temperatures (80–900 °C) in order to reveal process parameters that allow deposition of coatings with higher chemical resistance. The results obtained demonstrate that application of processes that yield films with lower concentration of residual impurities as well as crystallization of films in thermal ALD processes leads to significant decrease of etching rate. Crystalline films of materials studied showed etching rates down to values of < 5 pm/s. - Highlights: • Etching of atomic layer deposited thin metal oxide films in hot H{sub 2}SO{sub 4} was studied. • Smallest etching rates of < 5 pm/s for TiO{sub 2}, Al{sub 2}O{sub 3}, and Cr{sub 2}O{sub 3} were reached. • Highest etching rate of 2.8 nm/s for Al{sub 2}O{sub 3} was occurred. • Remarkable differences in etching of non- and crystalline films were observed.

  15. Biocompatibility of GaSb thin films grown by RF magnetron sputtering

    Science.gov (United States)

    Nishimoto, Naoki; Fujihara, Junko; Yoshino, Katsumi

    2017-07-01

    GaSb may be suitable for biological applications, such as cellular sensors and bio-medical instrumentation because of its low toxicity compared with As (III) compounds and its band gap energy. Therefore, the biocompatibility and the film properties under physiological conditions were investigated for GaSb thin films with or without a surface coating. GaSb thin films were grown on quartz substrates by RF magnetron sputtering, and then coated with (3-mercaptopropyl) trimethoxysilane (MPT). The electrical properties, surface morphology, and crystal structure of the GaSb thin film were unaffected by the MPT coating. The cell viability assay suggested that MPT-coated GaSb thin films are biocompatible. Bare GaSb was particularly unstable in pH9 buffer. Ga elution was prevented by the MPT coating, although the Ga concentration in the pH 9 buffer was higher than that in the other solutions. The surface morphology and crystal structure were not changed by exposure to the solutions, except for the pH 9 buffer, and the thin film properties of MPT-coated GaSb exposed to distilled water and H2O2 in saline were maintained. These results indicate that MPT-coated GaSb thin films are biocompatible and could be used for temporary biomedical devices.

  16. Structural and electrical properties of large area epitaxial VO2 films grown by electron beam evaporation

    Science.gov (United States)

    Théry, V.; Boulle, A.; Crunteanu, A.; Orlianges, J. C.; Beaumont, A.; Mayet, R.; Mennai, A.; Cosset, F.; Bessaudou, A.; Fabert, M.

    2017-02-01

    Large area (up to 4 squared inches) epitaxial VO2 films, with a uniform thickness and exhibiting an abrupt metal-insulator transition with a resistivity ratio as high as 2.85 × 10 4 , have been grown on (001)-oriented sapphire substrates by electron beam evaporation. The lattice distortions (mosaicity) and the level of strain in the films have been assessed by X-ray diffraction. It is demonstrated that the films grow in a domain-matching mode where the distortions are confined close to the interface which allows growth of high-quality materials despite the high film-substrate lattice mismatch. It is further shown that a post-deposition high-temperature oxygen annealing step is crucial to ensure the correct film stoichiometry and provide the best structural and electrical properties. Alternatively, it is possible to obtain high quality films with a RF discharge during deposition, which hence do not require the additional annealing step. Such films exhibit similar electrical properties and only slightly degraded structural properties.

  17. Studies on chemical bath deposited CdS buffer layers for CIGS thin film solar cells%CIGS薄膜太阳能电池缓冲层CdS薄膜的制备研究

    Institute of Scientific and Technical Information of China (English)

    何丽秋

    2016-01-01

    目前CdS材料的制备方法有很多种,但是最常用的是化学水浴法。本文研究了浓度、反应溶液pH值、温度、沉积时间对CdS缓冲层薄膜的影响,对CIGS薄膜太阳能电池缓冲层CdS薄膜的制备方法进行了论述。%At present,the preparation methods of CdS has many kinds,The chemical bath deposition(CBD)is the most commonly method.In this review,the effects of concentration,pH,temperature and deposition time on the CdS buffer layer were studied.The preparation methods of CIGS thin film for CdS thin film solar cells were discussed.

  18. Investigation of annealing temperature effect on magnetron sputtered cadmium sulfide thin film properties

    Science.gov (United States)

    Akbarnejad, E.; Ghorannevis, Z.; Abbasi, F.; Ghoranneviss, M.

    2016-12-01

    Cadmium sulfide (CdS) thin films are deposited on the fluorine doped tin oxide coated glass substrate using the radio frequency magnetron sputtering setup. The effects of annealing in air on the structural, morphological, and optical properties of CdS thin film are studied. Optimal annealing temperature is investigated by annealing the CdS thin film at different annealing temperatures of 300, 400, and 500 °C. Thin films of CdS are characterized by X-ray diffractometer analysis, field emission scanning electron microscopy, atomic force microscopy, UV-Vis-NIR spectrophotometer and four point probe. The as-grown CdS films are found to be polycrystalline in nature with a mixture of cubic and hexagonal phases. By increasing the annealing temperature to 500 °C, CdS film showed cubic phase, indicating the phase transition of CdS. It is found from physical characterizations that the heat treatment in air increased the mean grain size, the transmission, and the surface roughness of the CdS thin film, which are desired to the application in solar cells as a window layer material.

  19. Elastic properties of B-C-N films grown by N{sub 2}-reactive sputtering from boron carbide targets

    Energy Technology Data Exchange (ETDEWEB)

    Salas, E.; Jiménez Riobóo, R. J.; Jiménez-Villacorta, F.; Prieto, C. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Cantoblanco, 28049 Madrid (Spain); Sánchez-Marcos, J. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Cantoblanco, 28049 Madrid (Spain); Dept. Química-Física Aplicada, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Muñoz-Martín, A.; Prieto, J. E.; Joco, V. [Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain)

    2013-12-07

    Boron-carbon-nitrogen films were grown by RF reactive sputtering from a B{sub 4}C target and N{sub 2} as reactive gas. The films present phase segregation and are mechanically softer than boron carbide films (a factor of more than 2 in Young's modulus). This fact can turn out as an advantage in order to select buffer layers to better anchor boron carbide films on substrates eliminating thermally induced mechanical tensions.

  20. Catalyst- and template-free low-temperature in situ growth of n-type CdS nanowire on p-type CdTe film and p-n heterojunction properties

    Science.gov (United States)

    Ma, Ligang; Liu, Wenchao; Cai, Hongling; Zhang, Fengming; Wu, Xiaoshan

    2016-12-01

    CdS is an important semiconductor used in optoelectronic devices. Simple techniques for growing CdS nanostructures are thus essential at a low cost. This study presents a novel method for growing single-crystal n-type CdS nanowires on p-type CdTe films by thermal annealing in an H2S/N2 mixed gas flow, which does not require the help of a catalyst or template. The formation process and growth mechanism of the nanowires are investigated. Well-dispersed whiskerlike CdS nanostructures are obtained at an appropriate annealing temperature and duration. We suggest that the stress-driving mechanism of nanowire formation may contribute to the growth of CdS nanowires, and that the evaporation of Te through the boundaries of the CdS grain seeds plays an important role in the sustainable growth of nanowire. In addition, CdS/CdTe heterojunction device is fabricated on Mo glass. The I-V characteristic of the heterojunction in dark shows typical rectifying diode behavior. The turn-on voltage can be regulated by annealing conditions. Meanwhile, the obvious photovoltaic effect is obtained on the in situ growth heterojunction prepared at low annealing temperature. Hence, this is a new fabricated method for CdTe-based materials in the field of energy conversion.

  1. Characterizations of Cubic ZnMgO Films Grown on Si(111) at Low Substrate Temperature

    Institute of Scientific and Technical Information of China (English)

    邱东江; 吴惠桢; 陈乃波; 徐天宁

    2003-01-01

    Cubic ZnMgO thin films in the (100) orientation were grown on Si (111) substrates by reactive electron beamevaporation at low substrate temperature. X-ray photoelectron spectroscopy (XPS) analyses show that Mgcontent as high as 75 at.% in the cubic ZnMgO film can be obtained. Secondary ion mass spectroscopy (SIMS)measurement indicates the evidence of Mg richness in the interface between the ZnMgO film and the Si substrate,and it is probably the primary reason to form the MgO-like cubic ZnMgO structures rather than the wurtziteone. The optical band gap of cubic ZnMgO is estimated to be 5.76eV, which was measured by the transmissionspectrum of the cubic ZnMgO film grown on the sapphire substrate under the same growth condition with thaton Si (111). The band gap is of 2.39eV blueshifted compared with that of ZnO (3.37eV), which should renderapplications in the fabrication of ZnMgO-related heterostructures.

  2. Structural and electrical properties of tantalum oxide films grown by photo-assisted pulsed laser deposition

    Science.gov (United States)

    Zhang, Jun-Ying; Boyd, Ian W.

    2002-01-01

    We describe the growth of thin films of Ta 2O 5 on quartz and silicon (1 0 0) substrates by an in situ photo-assisted pulsed laser deposition (photo-PLD) using radiation from a Nd:YAG laser (wavelength, λ=532 nm) to stimulate the ablation, and from an excimer lamp to excite additional photochemistry. The layers grown were investigated by Fourier transform infrared (FT-IR) spectroscopy, UV spectrophotometry, atomic force microscopy (AFM), ellipsometry and electrical measurements. We have found that they exhibit a significant improvement in microstructure, and optical and electrical properties compared with conventional PLD films prepared under, otherwise, identical conditions. For example, FT-IR results showed that the suboxide content in the as-grown films deposited by the photo-PLD process is less, while the leakage current density was an order of magnitude less at around 10 -6 A/cm 2 at a bias of 1 V. These results indicate that this photo-PLD process approach can be advantageous for dielectric and optical oxide film growth.

  3. Influence of solution viscosity on hydrothermally grown ZnO thin films for DSSC applications

    Science.gov (United States)

    Marimuthu, T.; Anandhan, N.; Thangamuthu, R.; Surya, S.

    2016-10-01

    Zinc oxide (ZnO) nanowire arrays (NWAs) were grown onto zinc oxide-titanium dioxide (ZnO-TiO2) seeded fluorine doped tin oxide (FTO) conductive substrate by hydrothermal technique. X-ray diffraction (XRD) patterns depict that ZnO thin films are preferentially oriented along the (002) plane with hexagonal wurtzite structure. Viscosity measurements reveal that viscosity of the solutions linearly increases as the concentrations of the polyvinyl alcohol (PVA) increase in the growth solution. Field emission scanning electron microscope (FE-SEM) images show that the NWAs are vertically grown to seeded FTO substrate with hexagonal structure, and the growth of NWAs decreases as the concentration of the PVA increases. Stylus profilometer and atomic force microscopic (AFM) studies predict that the thickness and roughness of the films decrease with increasing the PVA concentrations. The NWAs prepared at 0.1% of PVA exhibits a lower transmittance and higher absorbance than that of the other films. The band gap of the optimized films prepared at 0.0 and 0.1% of PVA is found to be 3.270 and 3.268 eV, respectively. The photo to current conversion efficiency of the DSSC based on photoanodes prepared at 0.0 and 0.1% of PVA exhibits about 0.64 and 0.82%, respectively. Electrochemical impedance spectra reveal that the DSSC based on photoanode prepared at 0.1% of PVA has the highest charge transfer recombination resistance.

  4. Surface state conductivity in epitaxially grown Bi1-x Sb x (111) films

    Science.gov (United States)

    Koch, Julian; Kröger, Philipp; Pfnür, Herbert; Tegenkamp, Christoph

    2016-09-01

    Topologically non-trivial surface states were reported first on {{Bi}}1-xSb x bulk crystals. In this study we present transport measurements performed on thin {{Bi}}1-xSb x -films (up to 24 nm thickness) grown epitaxially on Si(111) with various Sb-concentrations (up to x = 0.22). The analysis of the temperature dependency allowed us to distinguish between different transport channels originating from surface and bulk bands as well as impurity states. At temperatures below 30 K the transport is mediated by surface states while at higher temperatures activated transport via bulk channels sets in. The surface state conductivity and bulk band gaps can be tuned by the Sb-concentration and film thickness, respectively. For films as thin as 4 nm the surface state transport is strongly suppressed in contrast to Bi(111) films grown under identical conditions. The impurity channel is of intrinsic origin due to the growth and alloy formation process and turns out to be located at the buried interface.

  5. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

    Science.gov (United States)

    Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko; Puurunen, Riikka L.

    2013-01-01

    Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas-solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic-organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

  6. MgB{sub 2} thin films grown on graphene/Ni–Mo alloy system

    Energy Technology Data Exchange (ETDEWEB)

    Linghu, Kehuan, E-mail: linghukehuan@126.com [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China); Song, Qingjun [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China); Collaborative Innovation Center of Quantum Matter, Beijing 100871 (China); Zhang, Huai [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China); Yang, QianQian [College of Applied Sciences, Beijing University of Technology, Beijing 100124 (China); Zhang, Jibo; Wu, Qianhong; Nie, Ruijuan [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China); Dai, Lun [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China); Collaborative Innovation Center of Quantum Matter, Beijing 100871 (China); Feng, Qingrong; Wang, Furen [School of Physics and State Key Laboratory for Artificial Structure and Mesoscopic Physics, Peking University, Beijing 100871 (China)

    2015-09-15

    Highlights: • Depositing MgB{sub 2} thin films on graphene/Ni–Mo alloy substrate by HPCVD is a completely new method. • The growth of MgB{sub 2} thin films in this system lays a good foundation of depositing MgB{sub 2} thick films. • We directly deposite MgB{sub 2} films on graphene(without transferring) which keeps graphene’s original morphology and properties. - Abstract: 200 nm Ni film is coated on 25 μm thick Mo foil, and graphene is grown on the Ni–Mo system by CVD method. After the annealing process of CVD, the Ni/Mo bilayer transforms into Ni–Mo alloy, then we have successfully fabricated MgB{sub 2} films on graphene/Ni–Mo alloy system via the hybrid physical–chemical vapor deposition (HPCVD) technique. The transition temperature T{sub c} onset is 38.25 K with a corresponding transition width of 0.75 K. The average thickness of MgB{sub 2} films is 200 nm (25% concentration B{sub 2}H{sub 6}). The critical current density derives from the magnetization measurement at 5 K is, j{sub c} (5 K, 0 T) = 9.6 × 10{sup 6} A/cm{sup 2}. We can easily deposite MgB{sub 2} on graphene/Ni–Mo alloy system with a lower B{sub 2}H{sub 6} concentration and less gas flow, which lays a good foundation for depositing MgB{sub 2} thick films. The graphene in this system is multilayer and with defects, it may act like an intermediary film for the growth of MgB{sub 2}, or a carbon-doping source.

  7. Preparation and structural properties of YBCO films grown on GaN/c-sapphire hexagonal substrate

    Energy Technology Data Exchange (ETDEWEB)

    Chromik, S., E-mail: stefan.chromik@savba.sk [Institute of Electrical Engineering, SAS, Dubravska cesta 9, 84104 Bratislava (Slovakia); Gierlowski, P. [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw (Poland); Spankova, M.; Dobrocka, E.; Vavra, I.; Strbik, V.; Lalinsky, T.; Sojkova, M. [Institute of Electrical Engineering, SAS, Dubravska cesta 9, 84104 Bratislava (Slovakia); Liday, J.; Vogrincic, P. [Department of Microelectronics, Slovak Technical University, Ilkovicova 3, 81219 Bratislava (Slovakia); Espinos, J.P. [Instituto de Ciencia de Materiales de Sevilla, Avda Americo Vespucio 49, 41092 Sevilla (Spain)

    2010-07-01

    Epitaxial YBCO thin films have been grown on hexagonal GaN/c-sapphire substrates using DC magnetron sputtering and pulsed laser deposition. An MgO buffer layer has been inserted between the substrate and the YBCO film as a diffusion barrier. X-ray diffraction analysis indicates a c-axis oriented growth of the YBCO films. {Phi}-scan shows surprisingly twelve maxima. Transmission electron microscopy analyses confirm an epitaxial growth of the YBCO blocks with a superposition of three a-b YBCO planes rotated by 120 deg. to each other. Auger electron spectroscopy and X-ray photoelectron spectroscopy reveal no surface contamination with Ga even if a maximum substrate temperature of 700 deg. C is applied.

  8. Lithium outdiffusion in LiTi2O4 thin films grown by pulsed laser deposition

    Science.gov (United States)

    Mesoraca, S.; Kleibeuker, J. E.; Prasad, B.; MacManus-Driscoll, J. L.; Blamire, M. G.

    2016-11-01

    We report surface chemical cation composition analysis of high quality superconducting LiTi2O4 thin films, grown epitaxially on MgAl2O4 (111) substrates by pulsed laser deposition. The superconducting transition temperature of the films was 13.8 K. Surface chemical composition is crucial for the formation of a good metal/insulator interface for integrating LiTi2O4 into full-oxide spin-filtering devices in order to minimize the formation of structural defects and increase the spin polarisation efficiency. In consideration of this, we report a detailed angle resolved x-ray photoelectron spectroscopy analysis. Results show Li segregation at the surface of LiTi2O4 films. We attribute this process due to outdiffusion of Li toward the outermost LiTi2O4 layers.

  9. Thin film phase diagram of iron nitrides grown by molecular beam epitaxy

    Science.gov (United States)

    Gölden, D.; Hildebrandt, E.; Alff, L.

    2017-01-01

    A low-temperature thin film phase diagram of the iron nitride system is established for the case of thin films grown by molecular beam epitaxy and nitrided by a nitrogen radical source. A fine-tuning of the nitridation conditions allows for growth of α ‧ -Fe8Nx with increasing c / a -ratio and magnetic anisotropy with increasing x until almost phase pure α ‧ -Fe8N1 thin films are obtained. A further increase of nitrogen content below the phase decomposition temperature of α ‧ -Fe8N (180 °C) leads to a mixture of several phases that is also affected by the choice of substrate material and symmetry. At higher temperatures (350 °C), phase pure γ ‧ -Fe4N is the most stable phase.

  10. Molecular-Beam Epitaxially Grown MgB2 Thin Films and Superconducting Tunnel Junctions

    Directory of Open Access Journals (Sweden)

    Jean-Baptiste Laloë

    2011-01-01

    Full Text Available Since the discovery of its superconducting properties in 2001, magnesium diboride has generated terrific scientific and engineering research interest around the world. With a of 39 K and two superconducting gaps, MgB2 has great promise from the fundamental point of view, as well as immediate applications. Several techniques for thin film deposition and heterojunction formation have been established, each with its own advantages and drawbacks. Here, we will present a brief overview of research based on MgB2 thin films grown by molecular beam epitaxy coevaporation of Mg and B. The films are smooth and highly crystalline, and the technique allows for virtually any heterostructure to be formed, including all-MgB2 tunnel junctions. Such devices have been characterized, with both quasiparticle and Josephson tunneling reported. MgB2 remains a material of great potential for a multitude of further characterization and exploration research projects and applications.

  11. Biomolecular papain thin films grown by matrix assisted and conventional pulsed laser deposition: A comparative study

    Science.gov (United States)

    György, E.; Pérez del Pino, A.; Sauthier, G.; Figueras, A.

    2009-12-01

    Biomolecular papain thin films were grown both by matrix assisted pulsed laser evaporation (MAPLE) and conventional pulsed laser deposition (PLD) techniques with the aid of an UV KrF∗ (λ =248 nm, τFWHM≅20 ns) excimer laser source. For the MAPLE experiments the targets submitted to laser radiation consisted on frozen composites obtained by dissolving the biomaterial powder in distilled water at 10 wt % concentration. Conventional pressed biomaterial powder targets were used in the PLD experiments. The surface morphology of the obtained thin films was studied by atomic force microscopy and their structure and composition were investigated by Fourier transform infrared spectroscopy. The possible physical mechanisms implied in the ablation processes of the two techniques, under comparable experimental conditions were identified. The results showed that the growth mode, surface morphology as well as structure of the deposited biomaterial thin films are determined both by the incident laser fluence value as well as target preparation procedure.

  12. RAPID COMMUNICATION: ? thin film bilayers grown by pulsed laser ablation deposition

    Science.gov (United States)

    Singh, S. K.; Palmer, S. B.; McK Paul, D.; Lees, M. R.

    1996-09-01

    We have grown superconducting thin films of 0022-3727/29/9/044/img2 (Y-123) on 0022-3727/29/9/044/img3 (PCMO) buffer layers and PCMO overlayers on Y-123 thin films using pulsed laser ablation deposition. For both sets of films below 50 K, the Y-123 layer is superconducting and the zero-field cooled PCMO layer is insulating. The application of a magnetic field of 8 T results in an insulator - metal transition in the PCMO layer. This field-induced conducting state is stable in zero magnetic field at low temperature. The PCMO layer can be returned to an insulating state by annealing above 100 K. This opens the way for the construction of devices incorporating these oxide materials in which the electronic properties of key components such as the substrate or the barrier layer can be switched in a controlled way by the application of a magnetic field.

  13. Photoluminescence properties of MgxZn1-xO films grown by molecular beam epitaxy

    Science.gov (United States)

    Wu, T. Y.; Huang, Y. S.; Hu, S. Y.; Lee, Y. C.; Tiong, K. K.; Chang, C. C.; Chou, W. C.; Shen, J. L.

    2017-02-01

    The optical properties of MgxZn1-xO films with x=0.03, 0.06, 0.08, and 0.11 grown by molecular beam epitaxy (MBE) have been studied by temperature-dependent photoluminescence (PL) measurement. It is presented that the full-width at half-maximum (FWHM) of the 12 K PL spectrum of MgZnO films increases with increasing Mg concentration and would deviate significantly from the simulation curve of Schubert model with higher Mg contents. The abnormal broader PL FWHM is inferred from larger compositional fluctuation by incorporating higher Mg contents, which results in larger effect of excitonic localization to induce more significant S-shaped behavior of the PL peak energy with temperature dependence. Additionally, the degree of localization increases as the linear proportion of the PL FWHM, indicating that the excitonic behavior in MgZnO films belong to the strong localization effect.

  14. Photoacoustic Study on a Photonic System CdS and Doped CdS

    Science.gov (United States)

    Sankar, N.; Ramachandran, K.; Sanjeeviraja, C.

    2002-12-01

    Using Photoacoustic spectroscopy thermal diffusion, thermal conductivity and energy band gap are studied on crystals of photonic system CdS and doped CdS grown by Physical Vapour transport. Optical band gap measured here agrees well with Photo current measurements. It is also found that the thermal diffusivity, effusivity, and optical band gap increases with increase of carrier concentration.

  15. CdS and Cd-Free Buffer Layers on Solution Phase Grown Cu2ZnSn(SxSe1- x)4 :Band Alignments and Electronic Structure Determined with Femtosecond Ultraviolet Photoemission Spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Haight, Richard; Barkhouse, Aaron; Wang, Wei; Yu, Luo; Shao, Xiaoyan; Mitzi, David; Hiroi, Homare; Sugimoto, Hiroki

    2013-12-02

    The heterojunctions formed between solution phase grown Cu2ZnSn(SxSe1- x)4(CZTS,Se) and a number of important buffer materials including CdS, ZnS, ZnO, and In2S3, were studied using femtosecond ultraviolet photoemission spectroscopy (fs-UPS) and photovoltage spectroscopy. With this approach we extract the magnitude and direction of the CZTS,Se band bending, locate the Fermi level within the band gaps of absorber and buffer and measure the absorber/buffer band offsets under flatband conditions. We will also discuss two-color pump/probe experiments in which the band bending in the buffer layer can be independently determined. Finally, studies of the bare CZTS,Se surface will be discussed including our observation of mid-gap Fermi level pinning and its relation to Voc limitations and bulk defects.

  16. Development of a novel electrochemical DNA biosensor based on elongated hexagonal-pyramid CdS and poly-isonicotinic acid composite film.

    Science.gov (United States)

    Zheng, Delun; Wang, Qingxiang; Gao, Feng; Wang, Qinghua; Qiu, Weiwei; Gao, Fei

    2014-10-15

    Three CdS materials with different shapes (i.e., irregular, rod-like, and elongated hexagonal-pyramid) were hydrothermally synthesized through controlling the molar ratio of Cd(2+) to thiourea. Electrochemical experiments showed that the elongated hexagonal-pyramid CdS (eh-CdS) modified on glassy carbon electrode (GCE) had the higher electrical conductivity than the other two forms. Then the eh-CdS modified GCE was further modified with a layer of poly-isonicotinic acid (PIA) through electro-polymerization in IA solution to enhance the stability and functionality of the interface. The layer-by-layer modification process was characterized by atomic force microscopy and electrochemistry. Then 5'-amino functionalized DNA was immobilized on the electrode surface through coupling with the carboxylic groups derived from PIA-eh-CdS composite film. The hybridization performance of the developed biosensor was evaluated using methylene blue as redox indicator, and the results showed that the peak currents of methylene blue varied with target concentrations in a wide linear range from 1.0 × 10(-14)M to 1.0 × 10(-9)M with a low detection limit of 3.9 × 10(-15)M. The biosensor also showed high stability and good discrimination ability to the one-base, three-base mismatched and non-complementary sequence.

  17. Polycrystalline GaSb thin films grown by co-evaporation

    Institute of Scientific and Technical Information of China (English)

    Qiao Zaixiang; Sun Yun; He Weiyu; He Qing; Li Changjian

    2009-01-01

    We report optical and electrical properties of polycrystalline GaSb thin films which were successfully grown by co-evaporation on soda-lime glass substrates. The thin films have preferential orientation of the (111)direction. SEM results indicate that the average grain size of GaSb thin film is 500 nm with the substrate temperature of 560 ℃. The average reflectance of GaSb thin film is about 30% and the absorption coefficient is of the order of 104 cm-1. The optical bandgap of GaSb thin film is 0.726 eV. The hole concentration shows a clear increasing trend as the Ga-evaporation-temperature/Sb-evaporation-temperature (TGa/TSb) ratio increases. When the Ga crucible temperature is 810 ℃ and the antinomy crucible temperature is 415 ℃, the hole concentration of polycrystalline GaSb is 2 x 1017 cm-3 and the hole mobility is 130 cm2/(V-s). These results suggest that polycrystalline GaSb thin film is a good candidate for the use as a cheap material in TPV cells.

  18. Preparation and chemical characterization of neodymium-doped molybdenum oxide films grown using spray pyrolysis

    Energy Technology Data Exchange (ETDEWEB)

    Alfonso, J. E. [Universidad Nacional de Colombia, Departamento de Fisica, Grupo de Ciencia Materiales y Superficies, AA 5997 Bogota DC (Colombia); Moreno, L. C., E-mail: jealfonsoo@unal.edu.co [Universidad Nacional de Colombia, Departamento de Quimica, AA 5997 Bogota DC (Colombia)

    2014-07-01

    We studied the crystalline, morphology, and surface composition of Nd-doped molybdenum oxide films grown on glass slides through spray pyrolysis. After fabrication, the films were subjected to thermal treatment in oxygen for periods ranging from 2 to 20 hours. The films were structurally characterized though X-ray diffraction (XRD), their bulk chemical composition was determined using Energy-Dispersive X-ray analysis (EDX), and their surface composition was determined using X-ray Photoelectron Spectroscopy (XP S). The XRD results show that the films obtained from different dissolution volumes and at substrate temperature of 300 grades C exhibit the characteristics of the oxygen-deficient molybdenum trioxide Mo{sub 9}O{sub 26} phase. The films subjected to different thermal treatments exhibit a mixture of Mo{sub 9}O{sub 26} and Mo{sub 17}O{sub 47} phases. EDX study shows the energy belonging to the L line of Nd. Finally, films doped with Nd and subjected to a thermal treatment of 20 h were analyzed through XP S, showing the binding energies at the crystalline lattice correspond to Nd{sub 2} (MoO{sub 4}){sub 3} and Nd{sub 2}Mo{sub 2}O{sub 7}. (Author)

  19. Electronic structure analysis of GaN films grown on r- and a-plane sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Mishra, Monu; Krishna TC, Shibin; Aggarwal, Neha [Physics of Energy Harvesting Division, CSIR-National Physical Laboratory (CSIR-NPL), Dr. K.S. Krishnan Marg, New Delhi 110012 (India); Academy of Scientific and Innovative Research (AcSIR), CSIR-NPL Campus, Dr. K.S. Krishnan Marg, New Delhi 110012 (India); Vihari, Saket [Physics of Energy Harvesting Division, CSIR-National Physical Laboratory (CSIR-NPL), Dr. K.S. Krishnan Marg, New Delhi 110012 (India); Gupta, Govind, E-mail: govind@nplindia.org [Physics of Energy Harvesting Division, CSIR-National Physical Laboratory (CSIR-NPL), Dr. K.S. Krishnan Marg, New Delhi 110012 (India); Academy of Scientific and Innovative Research (AcSIR), CSIR-NPL Campus, Dr. K.S. Krishnan Marg, New Delhi 110012 (India)

    2015-10-05

    Graphical abstract: Substrate orientation induced changes in surface chemistry, band bending, hybridization states, electronic properties and surface morphology of epitaxially grown GaN were investigated via photoemission spectroscopic and Atomic Force Microscopic measurements. - Highlights: • Electronic structure and surface properties of GaN film grown on r/a-plane sapphire. • Downward band bending (0.5 eV) and high surface oxide is observed for GaN/a-sapphire. • Electron affinity and ionization energy is found to be higher for GaN/a-sapphire. - Abstract: The electronic structure and surface properties of epitaxial GaN films grown on r- and a-plane sapphire substrates were probed via spectroscopic and microscopic measurements. X-ray photoemission spectroscopic (XPS) measurements were performed to analyse the surface chemistry, band bending and valence band hybridization states. It was observed that GaN/a-sapphire display a downward band bending of 0.5 eV and possess higher amount of surface oxide compared to GaN/r-sapphire. The valence band (VB) investigation revealed that the hybridization corresponds to the interactions of Ga 4s and Ga 4p orbitals with N 2p orbital, and result in N2p–Ga4p, N2p–Ga4s{sup ∗}, mixed and N2p–Ga4s states. The energy band structure and electronic properties were measured via ultraviolet photoemission spectroscopic (UPS) experiments. The band structure analysis and electronic properties calculations divulged that the electron affinity and ionization energy of GaN/a-sapphire were 0.3 eV higher than GaN/r-sapphire film. Atomic Force Microscopic (AFM) measurements revealed faceted morphology of GaN/r-sapphire while a smooth pitted surface was observed for GaN/a-sapphire film, which is closely related to surface oxide coverage.

  20. Vacuum ultraviolet annealing of thin films grown by pulsed laser deposition

    Science.gov (United States)

    Craciun, Valentin; Craciun, Doina; Andreazza, Pascal; Perriere, Jacques; Boyd, Ian W.

    1999-01-01

    The effect of a post-deposition annealing treatment in 1 bar of oxygen at moderate temperatures (excimer lamp upon thin ZrO 2 and hydroxyapatite (HAp) films grown by the pulsed laser deposition (PLD) technique was investigated. The optical and structural properties of the films were improved by this treatment, the lower the deposition temperature and, accordingly, the poorer the initial characteristics, the more significant the improvements. The combination of these two techniques allowed us to obtain at temperatures below 350°C highly textured (020) ZrO 2 films, exhibiting optical absorption coefficients lower than 5×10 2 cm -1 and high refractive index values of around 2.25 in the visible region of the spectrum. The VUV treatment was also beneficial for the partially crystalline HAp layers containing tetracalcium phosphate and calcium oxide phases grown by the PLD technique under a low pressure oxidising atmosphere of only 10 -5 torr without any water vapours. After the VUV-assisted anneal, the crystalline structure and the stoichiometry greatly improved while the percentage of the other crystalline phases initially present was many times reduced.

  1. AFM Study on Interface of HTHP As-grown Diamond Single Crystal and Metallic Film

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    The study for the interface of as-grown diamond and metallic film surrounding diamond is an attractive way for understanding diamond growth mechanism at high temperature and high pressure (HTHP), because it is that through the interface carbon atom groups from the molten film are transported to growing diamond surface. It is of great interest to perform atomic force microscopy (AFM) experiment, which provides a unique technique different from that of normal optical and electron microscopy studies, to observe the interface morphology. In the present paper,we report first that the morphologies obtained by AFM on the film are similar to those of corresponding diamond surface, and they are the remaining traces after the carbon groups moving from the film to growing diamond. The fine particles and a terrace structure with homogeneous average step height are respectively found on the diamond (100) and (111) surface. Diamond growth conditions show that its growth rates and the temperature gradients in the boundary layer of the molten film at HTHP result in the differences of surface morphologies on diamond planes,being rough on (100) plane and even on the (111) plane. The diamond growth on the (100) surface at HPHT could be considered as a process of unification of these diamond fine particles or of carbon atom groups recombination on the growing diamond crystal surface. Successive growth layer steps directly suggest the layer growth mechanism of the diamond (111) plane. The sources of the layer steps might be two-dimensional nuclei and dislocations.

  2. Transparent conductive Al-doped ZnO thin films grown at room temperature

    Energy Technology Data Exchange (ETDEWEB)

    Wang Yuping; Lu Jianguo; Bie Xun; Gong Li; Li Xiang; Song Da; Zhao Xuyang; Ye Wenyi; Ye Zhizhen [State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027 (China)

    2011-05-15

    Aluminum-doped ZnO (ZnO:Al, AZO) thin films were prepared on glass substrates by dc reactive magnetron sputtering from a Zn-Al alloy target at room temperature. The effects of the Ar-to-O{sub 2} partial pressure ratios on the structural, electrical, and optical properties of AZO films were studied in detail. AZO films grown using 100:4 to 100:8 Ar-to-O{sub 2} ratio result in acceptable quality films with c-axis orientated crystals, uniform grains, 10{sup -3} {Omega} cm resistivity, greater than 10{sup 20} cm{sup -3} electron concentration, and high transmittance, 90%, in the visible region. The lowest resistivity of 4.11x10{sup -3} {Omega} cm was obtained under the Ar-to-O{sub 2} partial pressure ratio of 100:4. A relatively strong UV emission at {approx}3.26 eV was observed in the room-temperature photoluminescence spectrum. X-ray photoelectron spectroscopy analysis confirmed that Al was introduced into ZnO and substitutes for Zn and doped the film n-type.

  3. Thermal evolution of Er silicate thin films grown by rf magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lo Savio, R; Miritello, M; Piro, A M; Grimaldi, M G; Priolo, F [MATIS CNR-INFM and Dipartimento di Fisica e Astronomia dell' Universita di Catania, via Santa Sofia 64, 95123 Catania (Italy); Iacona, F [CNR-IMM, Stradale Primosole 50, 95121 Catania (Italy)], E-mail: roberto.losavio@ct.infn.it

    2008-11-12

    Stoichiometric Er silicate thin films, monosilicate (Er{sub 2}SiO{sub 5}) and disilicate (Er{sub 2}Si{sub 2}O{sub 7}), have been grown on c-Si substrates by rf magnetron sputtering. The influence of annealing temperature in the range 1000-1200 deg. C in oxidizing ambient (O{sub 2}) on the structural and optical properties has been studied. In spite of the known reactivity of rare earth silicates towards silicon, Rutherford backscattering spectrometry shows that undesired chemical reactions between the film and the substrate can be strongly limited by using rapid thermal treatments. Monosilicate and disilicate films crystallize at 1100 and 1200 deg. C, respectively, as shown by x-ray diffraction analysis; the crystalline structures have been identified in both cases. Moreover, photoluminescence (PL) measurements have demonstrated that the highest PL intensity is obtained for Er{sub 2}Si{sub 2}O{sub 7} film annealed at 1200 deg. C. In fact, this treatment allows us to reduce the defect density in the film, in particular by saturating oxygen vacancies, as also confirmed by the increase of the lifetime of the PL signal.

  4. Crystallinity Improvement of ZnO Thin Film on Different Buffer Layers Grown by MBE

    Directory of Open Access Journals (Sweden)

    Shao-Ying Ting

    2012-01-01

    Full Text Available The material and optical properties of ZnO thin film samples grown on different buffer layers on sapphire substrates through a two-step temperature variation growth by molecular beam epitaxy were investigated. The thin buffer layer between the ZnO layer and the sapphire substrate decreased the lattice mismatch to achieve higher quality ZnO thin film growth. A GaN buffer layer slightly increased the quality of the ZnO thin film, but the threading dislocations still stretched along the c-axis of the GaN layer. The use of MgO as the buffer layer decreased the surface roughness of the ZnO thin film by 58.8% due to the suppression of surface cracks through strain transfer of the sample. From deep level emission and rocking curve measurements it was found that the threading dislocations play a more important role than oxygen vacancies for high-quality ZnO thin film growth.

  5. Characterization of Perovskite Films Grown by a Novel Low-Temperature Process for Uncooled IR Detector Applications

    Science.gov (United States)

    2008-12-01

    and semiconductor thin- films (Schwenzer et al., 2006; Kisailus et al, 2006; Brutchey and Morse, 2006). The resulting pyroelectric, perovskite -based...1 CHARACTERIZATION OF PEROVSKITE FILMS GROWN BY A NOVEL LOW- TEMPERATURE PROCESS FOR UNCOOLED IR DETECTOR APPLICATIONS W.L. Sarney* and J.W...multimetallic perovskite nanoparticle deposition, direct-write digitally-scripted laser phase conversion, and MEMS fabrication and optimization

  6. Photoluminescence properties of ZnO films grown on InP by thermally oxidizing metallic Zn films

    CERN Document Server

    Chen, S J; Zhang, J Y; Lu, Y M; Shen, D Z; Fan, X W

    2003-01-01

    Photoluminescence (PL) properties of ZnO films grown on (001) InP substrates by thermal oxidization of metallic Zn films, in which oxygen vacancies and interstitial Zn ions are compensated by P ions diffusing from (001) InP substrates, are investigated. X-ray diffraction spectra indicate that P ions have diffused into the Zn films and chemically combined with Zn ions to form Zn sub 3 P sub 2. Intense free exciton emission dominates the PL spectra of ZnO films with very weak deep-level emission. Low-temperature PL spectra at 79 K are dominated by neutral-donor bound exciton emission at 3.299 eV (I sub 4) with a linewidth of 17.3 meV and neutral-acceptor bound exciton emission at 3.264 eV. The free exciton emission increases with increasing temperature and eventually dominates the emission spectrum for temperature higher than 170 K. Furthermore, the visible emission around 2.3 eV correlated with oxygen deficiencies and interstitial Zn defects was quenched to a remarkable degree by P diffusing from InP substrate...

  7. The effect of different annealing conditions in undoped and Ag doped ZnO thin films grown by SILAR method

    OpenAIRE

    GÜNEY, HARUN

    2015-01-01

    Undoped, %3 and %5 Silver (Ag) doped zinc oxide (ZnO) thin films have been grown on glass substrates by simple and economic successive ionic layer absorption and reaction method (SILAR). All grown films were annealed vacuum and air to investigate to effective annealing at 573 K for 30 minutes. Energy-Dispersive-X-Ray-Fluorescence (EDXRF) spectroscopy showed %3 and %5 dopants Ag. Absorbance measurements showed that the optical band-gaps of all thin films were wide and generally decrease with a...

  8. Growth and structure of MBE grown TiO2 anatase films with rutile nano-crystallites

    Energy Technology Data Exchange (ETDEWEB)

    Shao, Rui; Wang, Chong M.; McCready, David E.; Droubay, Timothy C.; Chambers, Scott A.

    2007-03-15

    We have grown TiO2 anatase films with rutile nanocrystalline inclusions using molecular beam epitaxy under different growth conditions. This model system is important for investigating the role of rutile/anatase interfaces in heterogeneous photocatalysis. To control the film structure, we grew a pure anatase (001) layer at a slow rate and then increased the growth rate to drive the nucleation of rutile particles. Structure analysis indicates that the rutile phase has four preferred orientations in the anatase film.

  9. SEM, EDS, PL and absorbance study of CdTe thin films grown by CSS method

    Energy Technology Data Exchange (ETDEWEB)

    Hernandez-Torres, M.E.; Silva-Gonzalez, R.; Gracia-Jimenez, J.M. [Instituto de Fisica, BUAP, Apdo. Postal J-48, San Manuel, 72570 Puebla, Pue. (Mexico); Casarrubias-Segura, G. [CIE- UNAM, 62580 Temixco, Morelos (Mexico)

    2006-09-22

    Oxygen-doped CdTe films were grown on conducting glass substrates by the close spaced sublimation (CSS) method and characterized using SEM, EDS, photoluminescence (PL) and absorbance. A significant change in the polycrystalline morphology is observed when the oxygen proportion is increased in the deposition atmosphere. The EDS analysis showed that all samples are nonstoichiometric with excess Te. The PL spectra show emission bands associated with Te vacancies (V{sub Te}), whose intensities decrease as the oxygen proportion in the CSS chamber is increased. The oxygen impurities occupy Te vacancies and modify the surfaces states, improving the nonradiative process. (author)

  10. Preparation of AgInSe2 thin films grown by vacuum evaporation method

    Science.gov (United States)

    Matsuo, H.; Yoshino, K.; Ikari, T.

    2006-09-01

    Polycrystalline AgInSe2 thin films were successfully grown on glass substrates by an evaporation method. The starting materials were stoichiometrically mixed Ag2Se and In2Se3 powders. X-ray diffraction revealed that the sample annealed at 600 °C consisted of AgInSe2 single phase, with (112) orientation and a large grain size. The lattice constant (a axis) was close to JCPDS values. From optical transmittance and reflectance measurements, the bandgap energy was estimated to be 1.17 eV.

  11. Tantalum films with well-controlled roughness grown by oblique incidence deposition

    Science.gov (United States)

    Rechendorff, K.; Hovgaard, M. B.; Chevallier, J.; Foss, M.; Besenbacher, F.

    2005-08-01

    We have investigated how tantalum films with well-controlled surface roughness can be grown by e-gun evaporation with oblique angle of incidence between the evaporation flux and the surface normal. Due to a more pronounced shadowing effect the root-mean-square roughness increases from about 2 to 33 nm as grazing incidence is approached. The exponent, characterizing the scaling of the root-mean-square roughness with length scale (α), varies from 0.75 to 0.93, and a clear correlation is found between the angle of incidence and root-mean-square roughness.

  12. CdS nanoparticles sensitization of Al-doped ZnO nanorod array thin film with hydrogen treatment as an ITO/FTO-free photoanode for solar water splitting.

    Science.gov (United States)

    Hsu, Chih-Hsiung; Chen, Dong-Hwang

    2012-10-25

    Aluminum-doped zinc oxide (AZO) nanorod array thin film with hydrogen treatment possesses the functions of transparent conducting oxide thin film and 1-D nanostructured semiconductor simultaneously. To enhance the absorption in the visible light region, it is sensitized by cadmium sulfide (CdS) nanoparticles which efficiently increase the absorption around 460 nm. The CdS nanoparticles-sensitized AZO nanorod array thin film with hydrogen treatment exhibits significantly improved photoelectrochemical property. After further heat treatment, a maximum short current density of 5.03 mA cm-2 is obtained under illumination. They not only are much higher than those without CdS nanoparticles sensitization and those without Al-doping and/or hydrogen treatment, but also comparable and even slightly superior to some earlier works for the CdS-sensitized zinc oxide nanorod array thin films with indium tin oxide (ITO) or fluorine-doped tin oxide (FTO) as substrates. This demonstrated successfully that the AZO nanorod array thin film with hydrogen treatment is quite suitable as an ITO/FTO-free photoanode and has great potentials in solar water splitting after sensitization by quantum dots capable of visible light absorption.

  13. Analysis of the electrodeposition and surface chemistry of CdTe, CdSe, and CdS thin films through substrate-overlayer surface-enhanced Raman spectroscopy.

    Science.gov (United States)

    Gu, Junsi; Fahrenkrug, Eli; Maldonado, Stephen

    2014-09-02

    The substrate-overlayer approach has been used to acquire surface enhanced Raman spectra (SERS) during and after electrochemical atomic layer deposition (ECALD) of CdSe, CdTe, and CdS thin films. The collected data suggest that SERS measurements performed with off-resonance (i.e. far from the surface plasmonic wavelength of the underlying SERS substrate) laser excitation do not introduce perturbations to the ECALD processes. Spectra acquired in this way afford rapid insight on the quality of the semiconductor film during the course of an ECALD process. For example, SERS data are used to highlight ECALD conditions that yield crystalline CdSe and CdS films. In contrast, SERS measurements with short wavelength laser excitation show evidence of photoelectrochemical effects that were not germane to the intended ECALD process. Using the semiconductor films prepared by ECALD, the substrate-overlayer SERS approach also affords analysis of semiconductor surface adsorbates. Specifically, Raman spectra of benzenethiol adsorbed onto CdSe, CdTe, and CdS films are detailed. Spectral shifts in the vibronic features of adsorbate bonding suggest subtle differences in substrate-adsorbate interactions, highlighting the sensitivity of this methodology.

  14. Room-temperature ferromagnetism in V-doped GaN thin films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Souissi, M.; El Jani, B. [Unite de Recherche sur les Hetero-Epitaxies et Applications, Faculte des Sciences de Monastir, 5000 Monastir (Tunisia); Schmerber, G.; Derory, A. [Institut de Physique et Chimie des Materiaux de Strasbourg (IPCMS), UMR7504 CNRS-UDS, 23 rue du Loess, BP 43, 67034 Strasbourg Cedex 2 (France)

    2010-09-15

    V-doped GaN thin films were grown on c-sapphire substrate by metal organic chemical vapour deposition method (MOCVD). We have used vanadium tetrachloride (VCl{sub 4}) to intentionally incorporate vanadium (V) during the crystal growth of GaN. X-ray diffraction measurements revealed no secondary phase in the samples. Magnetic experiments using superconducting quantum interference device (SQUID) showed clear hysteresis loop in magnetization versus applied field (M -H) curves for V-doped GaN films. The ferromagnetic behavior was evidenced at 300 K, implying the Curie temperature to be over 300 K. Strong and broad blue-luminescent band (centered at 2.6 eV) is induced by the V doping in GaN. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  15. Growth and Characterization of Semi-Insulating GaN Films Grown by MOCVD

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    High resistivity unintentionally doped GaN films were grown on (0001) sapphire substrates by metalorganic chemical vapor deposition. The surface morphology of the layer was measured by both atomic force microscopy and scanning electron microscopy. The results show that the films have mirror-like surface morphology with root mean square of 0.3 nm. The full width at half maximum of double crystal X-ray diffraction rocking curve for (0002) GaN is about 5.22 arcmin, indicative of high crystal quality. The resistivity of the GaN epilayers at room temperature and at 250 ℃ was measured to be approximate 109 and 106 Ω·cm respectively, by variable temperature Hall measurement. Deep level traps in the GaN epilayers were investigated by thermally stimulated current and resistivity measurements.

  16. Scaling behavior of the surface roughness of platinum films grown by oblique angle deposition

    Science.gov (United States)

    Dolatshahi-Pirouz, A.; Hovgaard, M. B.; Rechendorff, K.; Chevallier, J.; Foss, M.; Besenbacher, F.

    2008-03-01

    Thin platinum films with well-controlled rough surface morphologies are grown by e-gun evaporation at an oblique angle of incidence between the deposition flux and the substrate normal. Atomic force microscopy is used to determine the root-mean-square value w of the surface roughness on the respective surfaces. From the scaling behavior of w , we find that while the roughness exponent α remains nearly unchanged at about 0.90, the growth exponent β changes from 0.49±0.04 to 0.26±0.01 as the deposition angle approaches grazing incidence. The values of the growth exponent β indicate that the film growth is influenced by both surface diffusion and shadowing effects, while the observed change from 0.49 to 0.26 can be attributed to differences in the relative importance of diffusion and shadowing with the deposition angle.

  17. Effect of external stress on phase diagrams and dielectric properties of epitaxial ferroelectric thin films grown on orthorhombic substrates

    Institute of Scientific and Technical Information of China (English)

    L(U) Ye-gang; DENG Shui-feng; GONG Lun-jun; YANG Jian-tao

    2006-01-01

    A Landau-Ginsburg-Devonshire(LD)-type thermodynamic theory was used to describe the effect of external stress on phase diagrams and dielectric properties of epitaxial ferroelectric thin films grown on orthorhombic substrates which induce nonequally biaxial misfit strains in the films plane. The "misfit strain-external stress" and "external stress-temperature" phase diagrams were constructed for single-domain BaTiO3(BT) and PbTiO3(PT) thin films. It is shown that the external stress may lead to the rotation of the spontaneous polarization and a gradual change of its magnitude, which may result in phase transition. Nonequally biaxial misfit strains dependence of the stability of polarization states may be governed by external stress. At room temperature,stress-induced ferroelectric/paraelectric phase transition which occurs in film on cubic substrate does not take place in the ferroelectric thin film grown on orthorhombic substrate. It is also shown that the nonequally misfit strains in the film plane may lead to the appearance of new phases which do not form in films grown on cubic substrates under external stress. The dependence of the dielectric response on the external stress is also studied. It is shown that the dielectric constants of single-domain PT and BT films are very sensitive to the external stress under the given anisotropic misfit strains-temperature conditions. It presents theoretical evidence that the external stress and anisotropic misfit strains can be employed for improving the thin films physical properties.

  18. Transport properties of as-grown MgB{sub 2} films using micro-bridge

    Energy Technology Data Exchange (ETDEWEB)

    Iriuda, H. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Harada, Y. [Iwate Industry Promotion Center, 3-35-2 Iiokashinden, Morioka, Iwate 020-0852 (Japan)]. E-mail: yharada@luck.ocn.ne.jp; Goto, S. [Lightom, 95-2 Sugo, Takizawa 020-0173 (Japan); Shimizu, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Takahashi, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Kuroha, M. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Oba, T. [Faculty of Materials science and Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Seki, M. [Faculty of Materials science and Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Nakanishi, Y. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka 020-8551 (Japan); Yoshizawa, M. [Iwate Industry Promotion Center, 3-35-2 Iiokashinden, Morioka, Iwate 020-0852 (Japan)

    2006-10-01

    The intermetallic superconductor magnesium diboride (MgB{sub 2}) is a promising candidate for use in superconducting electronic devices due to its high transition temperature (T{sub c}) and simple AlB{sub 2} type structure. Its application requires the development of a high-quality film fabrication process. We have previously reported the growth of MgB{sub 2} films deposited on MgO (1 0 0), SrTiO{sub 3} (1 0 0) and Al{sub 2}O{sub 3} (0 0 0 1) substrate using a co-evaporation method combined with a molecular beam epitaxy (MBE) apparatus. In this paper, we report on the details of the transport properties of these as-grown MgB{sub 2} films. These film's basal properties were investigated by XRD, RHEED, SQUID and the dc-4 probe method. Micro-bridges made using micro-processing methods such as photolithography and dry etching were used for transport measurements. All bridges were 10 {mu}m wide x 30 {mu}m long to allow estimation of their critical current density using the dc-4 probe method. We discuss the relationship between critical current densities and the substrates used.

  19. Thermal stability of MBE-grown epitaxial MoSe2 and WSe2 thin films

    Science.gov (United States)

    Chang, Young Jun; Choy, Byoung Ki; Phark, Soo-Hyon; Kim, Minu

    Layered transition metal dichalcogenides (TMDs) draw much attention, because of its unique optical properties and band structures depending on the layer thicknesses. However, MBE growth of epitaxial films demands information about thermal stability of stoichiometry and related electronic structure for high temperature range. We grow epitaxial MoSe2 and WSe2 ultrathin films by using molecular beam epitaxy (MBE). We characterize stoichiometry of films grown at various growth temperature by using various methods, XPS, EDX, and TOF-MEIS. We further test high temperature stability of electronic structure for those films by utilizing in-situ ellipsometry attached to UHV chamber. We discuss threshold temperatures up to 700~1000oC, at which electronic phases changes from semiconductor to metal due to selenium deficiency. This information can be useful for potential application of TMDs for fabrication of Van der Waals multilayers and related devices. This research was supported by Nano.Material Technology Development Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning. (2009-0082580), NRF-2014R1A1A1002868.

  20. Growth-induced optical anisotropy of epitaxial garnet films grown on (110)-oriented substrates

    Science.gov (United States)

    Kitamura, K.; Iyi, N.; Kimura, S.; Chevrier, F.; Devignes, J. M.; Le Gall, H.

    1986-08-01

    Garnet films of nominal composition (Y,Nd)3Ga5O12, were grown on (110) 1°-off Gd3Ga5O12 substrates for investigation of their growth-induced optical anisotropy. Optical birefringence and directions of the electric vectors of polarized rays passing through the films were measured under a polarizing microscope using a Brace-Köhler compensator. The growth-induced anisotropy of these films optically exhibited orthorhombic characteristics with the X, Y, and Z optic elasticity axes coinciding with the [001], [110], and [1¯10] directions, respectively. The crystallographic data obtained by means of single-crystal diffractometry suggested that the cubic crystal system of the garnet film was distorted, though very slightly, to an orthorhombic one with a,b, and c axes that coincided, respectively, with the [1¯10],[001], and [110] of the original cubic cell. In addition, by annealing at 1150 °C, this distortion disappeared and the crystal system reverted to cubic.

  1. Investigation of AgInS{sub 2} thin films grown by coevaporation

    Energy Technology Data Exchange (ETDEWEB)

    Arredondo, C A; Gordillo, G [Departamento de Fisica, Universidad Nacional de Colombia, Bogota (Colombia); J, Clavijo, E-mail: caarredondoo@unal.edu.c, E-mail: ggordillog@unal.edu.c [Departamento de Quimica, Universidad Nacional de Colombia, Bogota, Cr.30 N0 45-03 (Colombia)

    2009-05-01

    AgInS{sub 2} thin films were grown on soda-lime glass substrates by co-evaporation of the precursors in a two-step process. X-ray diffraction (XRD) measurements indicated that these compounds grow in different phases and with different crystalline structure depending upon the deposition conditions. However, through a parameter study, conditions were found to grow thin films containing only the AgInS{sub 2} phase with chalcopyrite type structure. In samples containing a mixture of several phases, the contribution in percentage terms of each phase to the whole compound was estimated with the help of the PowderCell simulation package. It was also found that the AgInS{sub 2} films present p-type conductivity, a high absorption coefficient (greater than 10{sub 4} cm{sub -1}) and an energy band gap Eg of about 1.95 eV, indicating that this compound has good properties to perform as absorbent layer in thin film tandem solar cells. The effect of the deposition conditions on the optical and morphological properties was also investigated through spectral transmitance and atomic force microscopy (AFM) measurements.

  2. Induced polarized state in intentionally grown oxygen deficient KTaO{sub 3} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Mota, D. A.; Romaguera-Barcelay, Y.; Tkach, A.; Agostinho Moreira, J.; Almeida, A. [IFIMUP and IN-Institute of Nanoscience and Nanotechnology, Department of Physics and Astronomy, Faculty of Science of University of Porto, Rua do Campo Alegre, 687, 4169-007 Porto (Portugal); Perez de la Cruz, J. [INESC TEC, Rua do Campo Alegre, 687, 4169-007 Porto (Portugal); Vilarinho, P. M. [Department of Ceramics and Glass Engineering, CICECO, University of Aveiro, 3810-193 Aveiro (Portugal); Tavares, P. B. [Centro de Quimica, Universidade de Tras-os-Montes e Alto Douro, Apartado 1013, 5001-801 Vila Real (Portugal)

    2013-07-21

    Deliberately oxygen deficient potassium tantalate thin films were grown by RF magnetron sputtering on Si/SiO{sub 2}/Ti/Pt substrates. Once they were structurally characterized, the effect of oxygen vacancies on their electric properties was addressed by measuring leakage currents, dielectric constant, electric polarization, and thermally stimulated depolarization currents. By using K{sub 2}O rich KTaO{sub 3} targets and specific deposition conditions, KTaO{sub 3-{delta}} oxygen deficient thin films with a K/Ta = 1 ratio were obtained. Room temperature X-ray diffraction patterns show that KTaO{sub 3-{delta}} thin films are under a compressive strain of 2.3% relative to KTaO{sub 3} crystals. Leakage current results reveal the presence of a conductive mechanism, following the Poole-Frenkel formalism. Furthermore, dielectric, polarization, and depolarization current measurements yield the existence of a polarized state below T{sub pol} {approx} 367 Degree-Sign C. A Cole-Cole dipolar relaxation was also ascertained apparently due to oxygen vacancies induced dipoles. After thermal annealing the films in an oxygen atmosphere at a temperature above T{sub pol}, the aforementioned polarized state is suppressed, associated with a drastic oxygen vacancies reduction emerging from annealing process.

  3. Scaling behavior of ZnPc thin films grown on CuI interlayers

    Science.gov (United States)

    Lee, Jinho; Jin, Sung-Il; Park, Chan Ryang; Yim, Sanggyu

    2015-01-01

    The growth behavior and consequent surface morphology evolution of zinc phthalocyanine (ZnPc) thin films deposited on a CuI interlayer were studied using atomic force microscopy and height difference correlation function (HDCF) analysis. The planar phthalocyanine thin films grown on non-interacting substrates have previously been reported to show anomalous scaling behavior such as large growth exponents, ß, sometimes larger than 0.5, and small anomaly values, ρ, typically smaller than 0.6. In contrast, ZnPc thin films on a CuI interlayer (CuI/ ZnPc) in this work showed conventional scaling behavior with a ß value of 0.26 ± 0.05 and a ρ value of 0.91. The HDCF analyses and x-ray diffraction results indicate that the expected interdigitated electron donor-acceptor interface was hardly formed for the CuI/ZnPc thin film system due to the lack of surface-parallel crystallites with high step edge barriers.

  4. Electronic properties of high-temperature superconducting thin films grown by pulsed laser deposition

    Science.gov (United States)

    Abrecht, M.; Ariosa, Daniel; Cloetta, D.; Margaritondo, Giorgio; Pavuna, Davor

    2002-11-01

    We use a pulsed laser deposition (PLD) setup to grow ultra-thin films of high temperature superconductors (HTSC) and transfer them in-situ into a photoemission chamber. Photoemission measurements on such films allow us to study non-cleavable materials, but can also give insights into aspects never measured before, like the influence of strain on the low energy electronic structure. Systematic studies of many different materials grown as films showed that Bi2Sr2CaCu2O8+x, Bi2Sr2Cu1O6+x, Bi2Sr2Ca2Cu3O10+x and La2-xSrxCuO4 films exhibit a conductor-like Fermi edge, but materials containing chains (such as YBa2Cu3O7-x) are prone to very rapid surface degradation, possibly related to critical oxygen loss at the surface. Among HTSC materials, La2-xSrxCuO4 is extremely interesting because of its rather simple structure and the fact that its critical temperature Tc can be enhanced by epitaxial strain. Here we present our first high resolution angular resolved photoemission spectroscopy (ARPES) results on 8 unit-cell thin La2-xSrxCuO4 films on SrLaAlO4 [001] substrates. Due to the lattice mismatch, such films are compressed in the copper oxygen planes and expanded in the c-axis direction. Results show a surprisingly modified Fermi surface compared to the one of non-strained samples.

  5. Sono-chemical successive ionic layer adsorption and reaction for the synthesis of CdS quantum dots onto mesoporous TiO2 photoanodes

    Science.gov (United States)

    Kim, Jae Ho; Kim, Geon Yang; Sohn, Sang Ho

    2015-07-01

    Aiming at high efficiency of quantum dot-sensitized solar cells (QDSCs) with CdS quantum dots (QDs)/mesoporous TiO2 (mp-TiO2) photoanodes, physical properties of CdS QDs/mp-TiO2 grown by sono-chemical successive ionic layer adsorption and reaction (SC-SILAR) process were studied. It is found that SC-SILAR process has less growth time and larger absorbance of CdS QDs besides a uniform penetration into mp-TiO2 films, compared with the conventional SILAR process. Experimental results show that SC-SILAR is an effective method for growing CdS QDs with high efficiency due to an extra sono-chemical energy of acoustic cavitation.

  6. Heterojunction oxide thin-film transistors with unprecedented electron mobility grown from solution

    Science.gov (United States)

    Faber, Hendrik; Das, Satyajit; Lin, Yen-Hung; Pliatsikas, Nikos; Zhao, Kui; Kehagias, Thomas; Dimitrakopulos, George; Amassian, Aram; Patsalas, Panos A.; Anthopoulos, Thomas D.

    2017-01-01

    Thin-film transistors made of solution-processed metal oxide semiconductors hold great promise for application in the emerging sector of large-area electronics. However, further advancement of the technology is hindered by limitations associated with the extrinsic electron transport properties of the often defect-prone oxides. We overcome this limitation by replacing the single-layer semiconductor channel with a low-dimensional, solution-grown In2O3/ZnO heterojunction. We find that In2O3/ZnO transistors exhibit band-like electron transport, with mobility values significantly higher than single-layer In2O3 and ZnO devices by a factor of 2 to 100. This marked improvement is shown to originate from the presence of free electrons confined on the plane of the atomically sharp heterointerface induced by the large conduction band offset between In2O3 and ZnO. Our finding underscores engineering of solution-grown metal oxide heterointerfaces as an alternative strategy to thin-film transistor development and has the potential for widespread technological applications. PMID:28435867

  7. Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

    Energy Technology Data Exchange (ETDEWEB)

    Härkönen, J. [Helsinki Institute of Physics, CMS Upgrade Project, Helsinki (Finland); Ott, J. [Helsinki Institute of Physics, CMS Upgrade Project, Helsinki (Finland); Laboratory of Radio Chemistry, University of Helsinki (Finland); Mäkelä, M. [Laboratory of Inorganic Chemistry, University of Helsinki (Finland); Arsenovich, T.; Gädda, A.; Peltola, T. [Helsinki Institute of Physics, CMS Upgrade Project, Helsinki (Finland); Tuovinen, E. [Helsinki Institute of Physics, CMS Upgrade Project, Helsinki (Finland); VTT Technical Research Centre of Finland, Microsystem and Nanoelectronics (Finland); Luukka, P.; Tuominen, E. [Helsinki Institute of Physics, CMS Upgrade Project, Helsinki (Finland); Junkes, A. [Institute for Experimental Physics, University of Hamburg (Germany); Niinistö, J.; Ritala, M. [Laboratory of Inorganic Chemistry, University of Helsinki (Finland)

    2016-09-21

    In this report we cover two special applications of Atomic Layer Deposition (ALD) thin films to solve these challenges of the very small size pixel detectors. First, we propose to passivate the p-type pixel detector with ALD grown Al{sub 2}O{sub 3} field insulator with a negative oxide charge instead of using the commonly adopted p-stop or p-spray technologies with SiO{sub 2}, and second, to use plasma-enhanced ALD grown titanium nitride (TiN) bias resistors instead of the punch through biasing structures. Surface passivation properties of Al{sub 2}O{sub 3} field insulator was studied by Photoconductive Decay (PCD) method and our results indicate that after appropriate annealing Al{sub 2}O{sub 3} provides equally low effective surface recombination velocity as thermally oxidized Si/SiO{sub 2} interface. Furthermore, with properly designed annealing steps, the TiN thin film resistors can be tuned to have up to several MΩ resistances with a few µm of physical size required in ultra-fine pitch pixel detectors.

  8. Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

    Science.gov (United States)

    Härkönen, J.; Ott, J.; Mäkelä, M.; Arsenovich, T.; Gädda, A.; Peltola, T.; Tuovinen, E.; Luukka, P.; Tuominen, E.; Junkes, A.; Niinistö, J.; Ritala, M.

    2016-09-01

    In this report we cover two special applications of Atomic Layer Deposition (ALD) thin films to solve these challenges of the very small size pixel detectors. First, we propose to passivate the p-type pixel detector with ALD grown Al2O3 field insulator with a negative oxide charge instead of using the commonly adopted p-stop or p-spray technologies with SiO2, and second, to use plasma-enhanced ALD grown titanium nitride (TiN) bias resistors instead of the punch through biasing structures. Surface passivation properties of Al2O3 field insulator was studied by Photoconductive Decay (PCD) method and our results indicate that after appropriate annealing Al2O3 provides equally low effective surface recombination velocity as thermally oxidized Si/SiO2 interface. Furthermore, with properly designed annealing steps, the TiN thin film resistors can be tuned to have up to several MΩ resistances with a few μm of physical size required in ultra-fine pitch pixel detectors.

  9. Enhancement in as-grown CuInSe{sub 2} film microstructure by a three potential pulsed electrodeposition method

    Energy Technology Data Exchange (ETDEWEB)

    Palacios-Padros, A. [Department of Physical Chemistry, University of Barcelona (UB), Institute for Bioengineering of Catalonia (IBEC) Marti i Franques 1, 08028 Barcelona (Spain); Caballero-Briones, F.; Sanz, Fausto [Department of Physical Chemistry, University of Barcelona (UB), Institute for Bioengineering of Catalonia (IBEC) Marti i Franques 1, 08028 Barcelona (Spain); CIBER-BBN, Maria de Luna 11, 50018 Zaragoza (Spain)

    2010-08-15

    P-type copper indium diselenide (CuInSe{sub 2}) films have been prepared onto ITO substrates by an electrodeposition method, that sequentially applies potential pulses at the deposition potential of each element Cu, Se and In, and then step it back in cyclically to induce the solid state reaction between the elements. Two electrolyte concentrations as well as three different pulse durations were assessed. The resulting films were compared with those deposited at fixed electrode potentials. As-grown films are nanocrystalline and have an E{sub g} {proportional_to} 0.95 eV. Raman spectroscopy shows that Se and Cu-Se contents decrease while pulse duration increases and electrolyte concentration decreases. Cu-Se phases are even absent for films grown at the low electrolyte concentration. These results represent a great improvement in the film phase purity reducing the need of post-deposition treatments. (author)

  10. Effect of Annealing on the Optical Properties of GaN Films Grown by Pulsed Laser Deposition

    Institute of Scientific and Technical Information of China (English)

    M.Baseer Haider; M.F.Al-Kuhaili; S.M.A.Durrani; Imran Bakhtiari

    2013-01-01

    In the present study,gallium nitride thin films were grown by using pulsed laser deposition.After the growth samples were annealed at 400 and 600 ℃ in the nitrogen atmosphere.Surface morphology of the as-grown and annealed samples was observed by atomic force microscopy.Post-growth annealing results in an improved surface roughness of the films.Chemical analysis of the samples was performed by X-ray photoelectron spectroscopy.Stoichiometric gallium nitride thin films were obtained for the samples annealed at 600 ℃.Optical measurements of the samples were performed to measure the band gap and optical constants of the films.Effect of annealing on the band gap and optical constants of the films was studied.

  11. Dynamic scaling and optical properties of Zn(S, O,OH) thin film grown by chemical bath deposition

    Institute of Scientific and Technical Information of China (English)

    Zhang Yi; Li Bo-Yan; Dang Xiang-Yu; Wu Li; Jin Jing; Li Feng-Yan; Ao Jian-Ping; Sun Yun

    2011-01-01

    The scaling behavior and optical properties of Zn(S,O and OH) thin films deposited on soda-lime glass substrates by chemical bath deposition method were studied by combined roughness measurements,scanning electron microscopy and optical properties measurement.From the scaling behaviour,the value of growth scaling exponent β,0.38±0.06,was determined.This value indicated that the Zn(S,O,OH) film growth in the heterogeneous process was influenced by the surface diffusion and shadowing effect.Results of the optical properties measurements disclosed that the transmittance of the film was in the region of 70%-88% and the optical properties of the film grown for 40 min were better than those grown under other conditions.The energy band gap of the film deposited with 40 min was around 3.63 eV.

  12. Influence of different carrier gases on the properties of ZnO films grown by MOCVD

    Directory of Open Access Journals (Sweden)

    Wang, Jinzhong

    2008-08-01

    Full Text Available ZnO films were grown on sapphire (001 substrate by atmospheric MOCVD using diethyl zinc and tertiary butanol precursors. The influence of different carrier gases (H2 and He on the properties was analyzed by their structural (XRD, microstructural (SEM and compositional (SIMS characterization. The intensity of the strongest diffraction peak from ZnO (002 plane was increased by about 2 orders of magnitude when He is used as carrier gas, indicating the significant enhancement in crystallinity. The surface of the samples grown using H2 and He carrier gases was composed of leaf-like and spherical grains respectively. Hydrogen [H] content in the film grown using H2 is higher than that using He, indicating that the [H] was influenced by the H2 carrier gas. Ultraviolet emission dominates the low temperature PL spectra. The emission from ZnO films grown using He show higher optical quality and more emission centers.

    Se depositaron películas de ZnO sobre sustratos de zafiro (001 utilizando dietil zinc y butanol terciario como precursores. La influencia de los diferentes gases portadores (H2 y He sobre las propiedades se estudió mediante la caracterización estructural (XRD, microestructural (SEM y composicional (SIMS. La intensidad del pico de difracción más importante del plano (002 del ZnO aumentó en dos órdenes de magnitud cuando se utiliza He como gas portador indicando un incremento significativo de la cristalinidad. La superficie de las muestras crecidas utilizando H2 y He está formada por granos en forma de hoja y de forma esférica respectivamente. El contenido en hidrógeno (H en la película es mayor cuando se utiliza H2 que cuando se utiliza He, indicando que la cantidad de hidrógeno está influenciada por el H2 del gas portador. La emisión ultravioleta domina el espectro PL de baja temperatura. La emisión de las películas de ZnO utilizando

  13. The frequency-dependent AC photoresistance behavior of ZnO thin films grown on different sapphire substrates.

    Science.gov (United States)

    Cholula-Díaz, Jorge L; Barzola-Quiquia, José; Videa, Marcelo; Yin, Chunhai; Esquinazi, Pablo

    2017-09-13

    Zinc oxide (ZnO) thin films were grown by pulsed layer deposition under an N2 atmosphere at low pressures on a- and r-plane sapphire substrates. Structural studies using X-ray diffraction confirmed that all films had a wurtzite phase. ZnO thin films on a- and r-plane sapphire have grown with orientations along the [0002] and [112[combining macron]0] directions, respectively. Room temperature photoluminescence measurements indicate that the presence of native point defects (interstitial zinc, oxygen vacancies, oxygen antisites and zinc vacancies) is more preponderant for ZnO thin films grown on the r-plane sapphire substrate than the sample grown on the a-plane sapphire substrate. Room temperature impedance spectroscopy measurements were performed in an alternating current frequency range from 40 to 10(5) Hz in the dark and under normal light. An unusual positive photoresistance effect is observed at frequencies above 100 kHz, which we suggest to be due to intrinsic defects present in the ZnO thin films. Furthermore, an analysis of the optical time response revealed that the film grown on the r-plane sapphire substrate responds faster (characteristic relaxation times for τ1, τ2 and τ3 of 0.05, 0.26 and 6.00 min, respectively) than the film grown on the a-plane sapphire substrate (characteristic relaxation times for τ1, τ2 and τ3 of 0.10, 0.73 and 4.02 min, respectively).

  14. Growth mechanism of single-crystalline NiO thin films grown by metal organic chemical vapor deposition

    Science.gov (United States)

    Roffi, Teuku Muhammad; Nozaki, Shinji; Uchida, Kazuo

    2016-10-01

    Nickel oxide (NiO) thin films were grown by atmospheric-pressure metal organic chemical vapor deposition (APMOCVD). Growth was carried out using various growth parameters, including the growth temperature, the input precursor (O2/Ni) ratio, and the type of substrate material. Effects of the growth parameters on the structural and electrical properties of the films were investigated. X-ray diffraction analysis revealed that the crystal structure and quality were strongly affected by the growth temperature and the type of substrate material. At an optimized growth temperature, single-crystalline NiO films were grown on MgO(100) and MgO(111) substrates in a cube-on-cube orientation relationship, while on an Al2O3(001) substrate, the film was grown in the NiO[111] direction. The use of MgO substrates successfully suppressed the formation of twin defects, which have been frequently reported in the growth of NiO. The difference in the formation of the twin defects on MgO and Al2O3 substrates was discussed. It was observed that the resistivity dependence on crystal quality was affected by the choice of substrate material. The effects of the precursor ratio on the transmittance and resistivity of the films were also investigated. Improved transparency in the visible wavelength region and higher conductivity were found in films grown with higher O2/Ni ratios.

  15. Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

    Science.gov (United States)

    Hojabri, Alireza

    2016-09-01

    Zirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase of annealing times in range 60-240 min. The composition of films was determined by Rutherford back scattering spectroscopy. Atomic force microscopy results exhibited that surface morphology and roughness of films depend on the annealing time. The refractive index of the films was calculated using Swanepoel's method. The optical band gap energy of annealed films decreased from 5.50 to 5.34 eV with increasing thermal annealing time.

  16. The structural state of epitaxial GaP films of different polarities grown on misoriented Si(001) substrates

    Science.gov (United States)

    Loshkarev, I. D.; Vasilenko, A. P.; Trukhanov, E. M.; Kolesnikov, A. V.; Putyato, M. A.; Esin, M. Yu.; Petrushkov, M. O.

    2017-02-01

    The structure of GaP films grown by molecular-beam epitaxy on vicinal Si(1113) substrates has been studied by X-ray diffraction. It is established that the crystalline lattice of a pseudomorphic film rotates about the axis toward increasing deviation from the singular orientation, while the subsequent relaxation leads to rotation in the opposite direction. This is valid for the films of both (001) and (001¯) polarities. Differences between the surface morphologies of relaxed and pseudomorphic GaP films are revealed.

  17. Comparative study on structural and optical properties of CdS films fabricated by three different low-cost techniques

    Energy Technology Data Exchange (ETDEWEB)

    Ravichandran, K. [P.G. and Research Department of Physics, AVVM. Sri Pushpam College, Poondi, Thanjavur District, Tamil Nadu 613503 (India)], E-mail: kkr1365@yahoo.com; Philominathan, P. [P.G. and Research Department of Physics, AVVM. Sri Pushpam College, Poondi, Thanjavur District, Tamil Nadu 613503 (India)

    2009-03-15

    Highly crystalline and transparent cadmium sulphide films were fabricated at relatively low temperature by employing an inexpensive, simplified spray technique using perfume atomizer (generally used for cosmetics). The structural, surface morphological and optical properties of the films were studied and compared with that prepared by conventional spray pyrolysis using air as carrier gas and chemical bath deposition. The films deposited by the simplified spray have preferred orientation along (1 0 1) plane. The lattice parameters were calculated as a = 4.138 A and c = 6.718 A which are well agreed with that obtained from the other two techniques and also with the standard data. The optical transmittance in the visible range and the optical band gap were found as 85% and 2.43 eV, respectively. The structural and optical properties of the films fabricated by the simplified spray are found to be desirable for opto-electronic applications.

  18. Control of native acceptor density in epitaxial Cu2O thin films grown by electrochemical deposition

    Science.gov (United States)

    Ashida, Atsushi; Sato, Shunsuke; Yoshimura, Takeshi; Fujimura, Norifumi

    2017-06-01

    Controlling the native carrier is essential for using Cu2O in devices such as solar cells. The origin of the native p-type carrier in Cu2O is thought to be copper vacancies (VCu). In this work, epitaxially grown Cu2O thin films were prepared by electrochemical deposition at a low temperature of 45 °C on a Pt (111) cathodic electrode. The sources of Cu and O for Cu2O were Cu2+ and OH- in the electrolyte and the ion concentrations were changed to control the stoichiometry of deposition and the density of VCu. The density of ionized acceptors (NA+) in the Cu2O films was evaluated by the C-V properties measured with Schottky electrodes. NA+ did not depend on [Cu2+], whereas NA+ increased with increasing [OH-] when [OH-] was larger than 10-3 mol/L (electrolyte pH >11) with [Cu2+] fixed at 10-1 mol/L. The ion concentration dependence of NA+ and the dependence of the total cathodic current density revealed that the generation of VCu was affected by a complex combination of the ion concentrations and film growth rate.

  19. Reproducibility and off-stoichiometry issues in nickelate thin films grown by pulsed laser deposition

    Science.gov (United States)

    Preziosi, Daniele; Sander, Anke; Barthélémy, Agnès; Bibes, Manuel

    2017-01-01

    Rare-earth nickelates are strongly correlated oxides displaying a metal-to-insulator transition at a temperature tunable by the rare-earth ionic radius. In PrNiO3 and NdNiO3, the transition is very sharp and shows an hysteretic behavior akin to a first-order transition. Both the temperature at which the transition occurs and the associated resistivity change are extremely sensitive to doping and therefore to off-stoichiometry issues that may arise during thin film growth. Here we report that strong deviations in the transport properties of NdNiO3 films can arise in films grown consecutively under nominally identical conditions by pulsed laser deposition; some samples show a well-developed transition with a resistivity change of up to five orders of magnitude while others are metallic down to low temperatures. Through a detailed analysis of in-situ X-ray photoelectron spectroscopy data, we relate this behavior to large levels of cationic off-stoichoimetry that also translate in changes in the Ni valence and bandwidth. Finally, we demonstrate that this lack of reproducibility can be remarkably alleviated by using single-phase NdNiO3 targets.

  20. STM study of the Ga thin films grown on Si(111) surface

    Science.gov (United States)

    Tao, Min-Long; Tu, Yu-Bing; Sun, Kai; Ye, Juan; Hao, Shao-Jie; Xiao, Hua-Fang; Wang, Ya-Li; Xie, Zheng-Bo; Wang, Jun-Zhong

    2017-09-01

    Structural evolution of Ga thin films grown on the Si(111)-√{ 3 } × √{ 3 } -Ga template have been investigated with a low-temperature scanning tunneling microscopy (STM). The first Ga layer exhibits a stripe structure along the base vectors of Si(111) lattices. Individual Ga dimers have been directly visualized from the high-resolution STM images of the first Ga layer. The second Ga layer reveals a pseudo 1×1 structure with respect to the Si(111). A new 5×5 phase has been found in the second Ga layer when annealing the sample to 120 ℃. Further annealing to 150 ℃ leads to the formation of 6.3×6.3 phase, which is more stable than the 5×5 phase. The existences of a variety of superstructures of Ga films demonstrates the delicate balance between the interactions of Si(111)-Ga and Ga-Ga. These results shed important light on the epitaxial growth mechanism of Ga films on semiconductor surfaces.

  1. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition

    Science.gov (United States)

    Chiu, Hsiang-Chih; Chang, Huan-Pu; Lo, Fang-Yu; Yeh, Yu-Ting; Department of Physics, National Taiwan Normal University Collaboration

    Zinc Oxide (ZnO) nanostructures have potential applications in nano-electro-mechanical systems (NEMS) due to their unique physical properties. ZnO is also an excellent lubricant and hence a promising candidate for protective coatings in NEMS. By means of atomic force microscopy (AFM), we have investigated the frictional properties of ZnO thin films prepared by pulsed laser deposition technique. In addition, UV illumination is used to convert the surface wettability of ZnO thin films from being more hydrophobic to superhydrophilic via the photo-catalyst effect. We found that the frictional properties of the UV illuminated, superhydrophilic ZnO surface are strongly dependent on the environment humidity. While for hydrophobic ZnO, no such dependence is found. The observed frictional behaviors can be explained by the interplay between the surface roughness, environmental humidity and the presence of nanoscale capillary condensation forming between surface asperities at the tip-ZnO contact. Our results might find applications in future ZnO related NEMS. Frictional Properties of UV illuminated ZnO Thin Films Grown by Pulsed Laser Deposition.

  2. Electrical and mechanical stability of aluminum-doped ZnO films grown on flexible substrates by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Luka, G., E-mail: gluka@ifpan.edu.pl [Institute of Physics, Polish Academy of Sciences, Warsaw (Poland); Witkowski, B.S.; Wachnicki, L.; Jakiela, R. [Institute of Physics, Polish Academy of Sciences, Warsaw (Poland); Virt, I.S. [University of Rzeszow, Rzeszow (Poland); Drohobych Ivan Franko State Pedagogical University, Drohobych (Ukraine); Andrzejczuk, M.; Lewandowska, M. [Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw (Poland); Godlewski, M. [Institute of Physics, Polish Academy of Sciences, Warsaw (Poland); Department of Mathematics and Natural Sciences, College of Science, Cardinal Stefan Wyszynski University, Warsaw (Poland)

    2014-08-01

    Highlights: • Transparent and conductive ZnO:Al films were grown by atomic layer deposition. • The films were grown on flexible substrates at low growth temperatures (110–140 °C). • So-obtained films have low resistivities, of the order of 10{sup −3} Ω cm. • Bending tests indicated a critical bending radius of ≈1.2 cm. • Possible sources of the film resistivity changes upon bending are proposed. - Abstract: Aluminum-doped zinc oxide (AZO) films were grown on polyethylene terephthalate (PET) substrates by atomic layer deposition (ALD) at low deposition temperatures (110–140 °C). The films have low resistivities, ∼10{sup −3} Ω cm, and high transparency (∼90%) in the visible range. Bending tests indicated a critical bending radius of ≈1.2 cm, below which the resistivity changes became irreversible. The films deposited on PET with additional buffer layer are more stable upon bending and temperature changes.

  3. Ultrafast carrier dynamics and the role of grain boundaries in polycrystalline silicon thin films grown by molecular beam epitaxy

    Science.gov (United States)

    Titova, Lyubov V.; Cocker, Tyler L.; Xu, Sijia; Baribeau, Jean-Marc; Wu, Xiaohua; Lockwood, David J.; Hegmann, Frank A.

    2016-10-01

    We have used time-resolved terahertz spectroscopy to study microscopic photoconductivity and ultrafast photoexcited carrier dynamics in thin, pure, non-hydrogenated silicon films grown by molecular beam epitaxy on quartz substrates at temperatures ranging from 335 °C to 572 °C. By controlling the growth temperature, thin silicon films ranging from completely amorphous to polycrystalline with minimal amorphous phase can be achieved. Film morphology, in turn, determines its photoconductive properties: in the amorphous phase, carriers are trapped in bandtail states on sub-picosecond time scales, while the carriers excited in crystalline grains remain free for tens of picoseconds. We also find that in polycrystalline silicon the photoexcited carrier mobility is carrier-density-dependent, with higher carrier densities mitigating the effects of grain boundaries on inter-grain transport. In a film grown at the highest temperature of 572 °C, the morphology changes along the growth direction from polycrystalline with needles of single crystals in the bulk of the film to small crystallites interspersed with amorphous silicon at the top of the film. Depth profiling using different excitation wavelengths shows corresponding differences in the photoconductivity: the photoexcited carrier lifetime and mobility are higher in the first 100-150 nm from the substrate, suggesting that thinner, low-temperature grown polycrystalline silicon films are preferable for photovoltaic applications.

  4. Effect of silane flow rate on structural, electrical and optical properties of silicon thin films grown by VHF PECVD technique

    Energy Technology Data Exchange (ETDEWEB)

    Gope, Jhuma [Physics of Energy Harvesting Division, CSIR-Network of Institutes for Solar Energy, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012 (India); Department of Physics, Banaras Hindu University, Varanasi 221005 (India); Kumar, Sushil, E-mail: skumar@nplindia.org [Physics of Energy Harvesting Division, CSIR-Network of Institutes for Solar Energy, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012 (India); Sudhakar, S.; Rauthan, C.M.S. [Physics of Energy Harvesting Division, CSIR-Network of Institutes for Solar Energy, CSIR-National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi 110012 (India); Srivastava, P.C. [Department of Physics, Banaras Hindu University, Varanasi 221005 (India)

    2013-08-15

    Hydrogenated silicon thin films deposited by VHF PECVD process for various silane flow rates have been investigated. The silane flow rate was varied from 5 sccm to 30 sccm, maintaining all other parameters constant. The electrical, structural and optical properties of these films were systematically studied as a function of silane flow rate. These films were characterized by Raman spectroscopy, Scanning Electron Microscopy (SEM), atomic force microscopy (AFM), Fourier transform infrared (FTIR) spectroscopy and UV–visible (UV–Vis) spectroscopy. Different crystalline volume fraction (22%–60%) and band gap (∼1.58 eV–∼1.96 eV) were achieved for silicon thin films by varying the silane concentration. A transition from amorphous to nanocrystalline silicon has been confirmed by Raman and FTIR analysis. The film grown at this transition region shows the high conductivity in the order of 10{sup −4} Ω{sup −1} cm{sup −1}. - Highlights: • Silicon films grown using VHF PECVD at various F{sub silane} (silane flow rate). • Amorphous to nanocrystalline silicon transition at F{sub silane} ∼5 sccm–10 sccm. • Deposition rate increases with the increase of F{sub silane}. • Powder formation occurred beyond 20 sccm of F{sub silane}. • Film grown at 20 sccm shows max. crystalline fraction ∼60% with E{sub g} ∼1.58 eV.

  5. Synthesis of as-grown superconducting MgB_2 thin films by molecular beam epitaxy in UHV conditions

    OpenAIRE

    Harada, Y.; Udsuka, M.; Nakanishi, Y.; Yoshizawa, M.

    2004-01-01

    As-grown superconducting MgB_2 thin films have been grown on SrTiO_3(001), MgO(001), and Al_2O_3(0001) substrates by a molecular beam epitaxy (MBE) method with novel co-evaporation conditions of low deposition rate in ultra-high vacuum. The structural and physical properties of the films were studied by RHEED, XRD, electrical resistivity measurements, and SQUID magnetometer. The RHEED patterns indicate three-dimensional growth for MgB_2. The highest T_c determined by resistivity measurement w...

  6. Control of Defects in Aluminum Gallium Nitride ((Al)GaN) Films on Grown Aluminum Nitride (AlN) Substrates

    Science.gov (United States)

    2013-02-01

    like HEMTs . A nanolayer of AlGaN over GaN provides extra 2DEG charge density because of the piezoelectric effect of the AlGaN layer. The higher...Control of Defects in Aluminum Gallium Nitride ((Al) GaN ) Films on Grown Aluminum Nitride (AlN) Substrates by Iskander G. Batyrev, Chi-Chin Wu...Aluminum Gallium Nitride ((Al) GaN ) Films on Grown Aluminum Nitride (AlN) Substrates Iskander G. Batyrev and N. Scott Weingarten Weapons and

  7. Ionization potentials of transparent conductive indium tin oxide films covered with a single layer of fluorine-doped tin oxide nanoparticles grown by spray pyrolysis deposition

    OpenAIRE

    2005-01-01

    Indium tin oxide (ITO) films deposited with single layers of monodispersive fluorine-doped tin oxide (FTO) nanoparticles of several nanometers in size were grown on glass substrates by intermittent spray pyrolysis deposition using conventional atomizers. These films have significantly higher ionization potentials than the bare ITO and FTO films grown using the same technique. The ITO films covered with FTO particles of 7 nm in average size show an ionization potential of 5.01 eV, as compared ...

  8. Formation of the physical vapor deposited CdS Cu In,Ga Se2 interface in highly efficient thin film solar cells

    OpenAIRE

    Rusu, M.; Glatzel, Th.; Neisser, A.; Kaufmann, C.A.; Sadewasser, S.; Lux Steiner, M. Ch.

    2006-01-01

    We report on the buffer absorber interface formation in highly efficient 14.5 , AM1.5 ZnO CdS Cu In,Ga Se2 solar cells with a physical vapor deposited CdS buffer. For Se decapped Cu In,Ga Se2 CIGSe absorbers we observe sulfur passivation of the CIGSe grain boundaries during CdS growth and at the interface a thermally stimulated formation of a region with a higher band gap than that of the absorber bulk, determining the height of the potential barrier at the CdS CIGSe interface. For air ex...

  9. Fabricating superconducting interfaces between artificially grown LaAlO3 and SrTiO3 thin films

    Directory of Open Access Journals (Sweden)

    Danfeng Li

    2014-01-01

    Full Text Available Realization of a fully metallic two-dimensional electron gas (2DEG at the interface between artificially grown LaAlO3 and SrTiO3 thin films has been an exciting challenge. Here we present for the first time the successful realization of a superconducting 2DEG at interfaces between artificially grown LaAlO3 and SrTiO3 thin films. Our results highlight the importance of two factors—the growth temperature and the SrTiO3 termination. We use local friction force microscopy and transport measurements to determine that in normal growth conditions the absence of a robust metallic state at low temperature in the artificially grown LaAlO3/SrTiO3 interface is due to the nanoscale SrO segregation occurring on the SrTiO3 film surface during the growth and the associated defects in the SrTiO3 film. By adopting an extremely high SrTiO3 growth temperature, we demonstrate a way to realize metallic, down to the lowest temperature, and superconducting 2DEG at interfaces between LaAlO3 layers and artificially grown SrTiO3 thin films. This study paves the way to the realization of functional LaAlO3/SrTiO3 superlattices and/or artificial LaAlO3/SrTiO3 interfaces on other substrates.

  10. Low Microwave Surface Resistance in NdBa2Cu3O7-d Films Grown by Molecular Beam Epitaxy

    OpenAIRE

    2004-01-01

    We report the growth of NdBa2Cu3O7-d films on (100) MgO substrate by Molecular Beam Epitaxy (MBE). Large area NdBa2Cu3O7-d films with homogeneous superconducting properties were grown by precise control of stoichiometry and the optimisation of growth parameters. The stoichiometric ratio of Nd:Ba:Cu close to 1:2:3 yields films with TC of 94 K and JC values above 3.5 MA/cm2 at 77 K on bare MgO substrate. The NdBa2Cu3O7-d films grown under optimised conditions had excellent in-plane texture and ...

  11. Effects of Annealing Temperature on Properties of ZnO Thin Films Grown by Pulsed Laser Deposition

    Institute of Scientific and Technical Information of China (English)

    ZHUANG Hui-zhao; XUE Shou-bin; XUE Cheng-shan; HU Li-jun; LI Bao-li; ZHANG Shi-ying

    2007-01-01

    ZnO thin films are deposited on n-Si(111) substrates by pulsed laser deposition(PLD) system.Then the samples are annealed at different temperatures in air ambient and their properties are investigated particularly as a function of annealing temperature.The microstructure,morphology and optical properties of the as-grown ZnO films are studied by X-ray diffraction(XRD),atomic force microscope(AFM),Fourier transform infrared spectroscopy(FTIR) and photoluminescence(PL) spectra.The results show that the as-grown ZnO films have a hexagonal wurtzite structure with a preferred c-axis orientation.Moreover,the diameters of the ZnO crystallites become larger and the crystal quality of the ZnO films is improved with the increase of annealing temperature.

  12. Electrical and optical properties of VO2 thin films grown on various sapphire substrates by using RF sputtering deposition

    Science.gov (United States)

    Jung, Dae Ho; So, Hyeon Seob; Ko, Kun Hee; Park, Jun Woo; Lee, Hosun; Nguyen, Trang Thi Thu; Yoon, Seokhyun

    2016-12-01

    VO2 thin films were grown on a-, c-, m-, and r-plane sapphire and SiO2/Si substrates under identical conditions by using RF sputtering deposition from a VO2 target. The structural and the morphological properties of all VO2 films were investigated. The grain sizes of the VO2 films varied between 268 nm and 355 nm depending on the substrate's orientation. The electrical and the optical properties of all VO2 thin films were examined in detail. The metal-insulator transition temperature (TMI) varied with the substrate's orientation. The (200)/(bar 211 )-oriented VO2 films on the a-plane sapphire showed the lowest TMI of about 329.3 K (56.3 °C) while the (020)/(002)-VO2 films on the c-plane sapphire displayed the highest TMI of about 339.6 K (66.6 °C). The VO2 films showed reversible changes in the resistivity as large as 1.19 × 105 and a hysteresis of 2 K upon traversing the transition temperature. The variations observed in the TMI with respect to the substrate's orientation were due to changes in the lattice strain and the grain size distribution. Raman spectroscopy showed that metal (rutile) - insulator (monoclinic) transitions occurred via the M2 phase for VO2 films on the c-plane substrate rather than the direct M1 to rutile transition. The shifts in the phonon frequencies of the VO2 film grown on various sapphire substrates were explained in terms of the strain along the V-V atomic bond direction (cR). Our work shows a possible correlation between the transition parameters ( e.g., TMI, sharpness, and hysteresis width) and the width ( σ) of the grain size distribution. It also shows a possible correlation between the TMI and the resistivities at the insulating and the metallic phases for VO2 films grown on various sapphire substrates.

  13. Magnetotransport in an aluminum thin film on a GaAs substrate grown by molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    Lin Sheng-Di

    2011-01-01

    Full Text Available Abstract Magnetotransport measurements are performed on an aluminum thin film grown on a GaAs substrate. A crossover from electron- to hole-dominant transport can be inferred from both longitudinal resistivity and Hall resistivity with increasing the perpendicular magnetic field B. Also, phenomena of localization effects can be seen at low B. By analyzing the zero-field resistivity as a function of temperature T, we show the importance of surface scattering in such a nanoscale film.

  14. Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy.

    Science.gov (United States)

    Gu, Yi; Wang, Kai; Zhou, Haifei; Li, Yaoyao; Cao, Chunfang; Zhang, Liyao; Zhang, Yonggang; Gong, Qian; Wang, Shumin

    2014-01-13

    InPBi thin films have been grown on InP by gas source molecular beam epitaxy. A maximum Bi composition of 2.4% is determined by Rutherford backscattering spectrometry. X-ray diffraction measurements show good structural quality for Bi composition up to 1.4% and a partially relaxed structure for higher Bi contents. The bandgap was measured by optical absorption, and the bandgap reduction caused by the Bi incorporation was estimated to be about 56 meV/Bi%. Strong and broad photoluminescence signals were observed at room temperature for samples with xBi < 2.4%. The PL peak position varies from 1.4 to 1.9 μm, far below the measured InPBi bandgap.

  15. Thermal activation of nitrogen acceptors in ZnO thin films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Dangbegnon, J.K.; Talla, K.; Botha, J.R. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth (South Africa)

    2010-06-15

    Nitrogen doping in ZnO is inhibited by spontaneous formation of compensating defects. Perfect control of the nitrogen doping concentration is required, since a high concentration of nitrogen could induce the formation of donor defects involving nitrogen. In this work, the effect of post-growth annealing in oxygen ambient on ZnO thin films grown by Metalorganic Chemical Vapor Deposition, using NO as both oxidant and nitrogen dopant, is studied. After annealing at 700 C and above, low-temperature photoluminescence shows the appearance of a transition at {proportional_to}3.23 eV which is interpreted as pair emission involving a nitrogen acceptor. A second transition at {proportional_to}3.15 eV is also discussed. This work suggests annealing as a potential means for p-type doping using nitrogen (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  16. Interface between metallic film from Fe-Ni-C system and HPHT as-grown diamond single crystal

    Institute of Scientific and Technical Information of China (English)

    许斌; 李木森; 尹龙卫; 刘玉先; 崔建军; 宫建红

    2003-01-01

    Microstructures of surface layer (near diamond) of the metallic film from Fe-Ni-C system are composed of (Fe,Ni)3C, (Fe,Ni)23C6 and γ-(Fe,Ni), from which it can be assumed that graphite isn't directly catalyzed into diamond through the film and there exists a transition phase (Fe,Ni)3C that can decompose into diamond structure. AFM morphologies on the film/diamond interface are traces preserved after carbon groups moving from the film to diamond. The morphologies on the as-grown diamond are similar to those on corresponding films, being spherical on (100) face and sawtooth-like steps on (111) face. Diamond growth rates and temperature gradients in boundary layer of the molten film at HPHT result in morphology differences.

  17. Properties of MgB{sub 2} films grown at various temperatures by hybrid physical-chemical vapour deposition

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Ke; Veldhorst, Menno; Li, Qi; Xi, X X [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Lee, Che-Hui; Lamborn, Daniel R; DeFrain, Raymond; Redwing, Joan M [Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States)

    2008-09-15

    A hybrid physical-chemical vapour deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB{sub 2} thin films and thick films at various temperatures. We are able to grow superconducting MgB{sub 2} thin films at temperatures as low as 350 deg. C with a T{sub c0} of 35.5 K. MgB{sub 2} films up to 4 {mu}m in thickness grown at 550 deg. C have J{sub c} over 10{sup 6} A cm{sup -2} at 5 K and zero applied field. The low deposition temperature of MgB{sub 2} films is desirable for all-MgB{sub 2} tunnel junctions and MgB{sub 2} thick films are important for applications in coated conductors.

  18. Zinc sulfide and terbium-doped zinc sulfide films grown by traveling wave reactor atomic layer epitaxy

    CERN Document Server

    Yun, S J; Nam, K S

    1998-01-01

    Zinc sulfide (ZnS) and terbium-doped ZnS (ZnS:Tb) thin films were grown by traveling wave reactor atomic layer epitaxy (ALE). In the present work, ZnCl sub 2 , H sub 2 S, and tris (2,2,6,6-tetramethyl-3,5-heptandionato) terbium (Tb(tmhd) sub 3) were used as the precursors. The dependence of crystallinity and Cl content of ZnS films was investigated on the growth temperature. ZnS and ZnS:Tb films grown at temperatures ranging from 400 to 500 .deg. C showed a hexagonal-2H crystalline structure. The crystallinity of ZnS film was greatly enhanced as the temperature increased. At growth temperatures higher than 450.deg.C, the films showed preferred orientation with mainly (002) diffraction peak. The Cl content decreased from approximately 9 to 1 at.% with the increase in growth temperature from 400 to 500 .deg. C. The segregation of Cl near the surface region and the incorporation of O from Tb(tmhd) sub 3 during ALE process were also observed using Auger electron spectroscopy. The ALE-grown ZnS and ZnS:Tb films re...

  19. Characteristics of Fluorine-doped tin oxide thin films grown by Streaming process for Electrodeless Electrochemical Deposition

    Science.gov (United States)

    Yusuf, Gbadebo; Khalilzadeh-Rezaie, Farnood; Cleary, Justin W.; Oladeji, Isaiah O.; Suu, Koukou; Schoenfeld, Winston V.; Peale, Robert E.; Awodugba, Ayodeji O.

    2015-04-01

    This work investigated the characteristics of SnO2: F films grown by Streaming Process for Electrodeless Electrochemical Deposition (SPEED). Stannic chloride (SnCl4) and ammonium fluoride (NH4 F) was dissolved in a mixture of deionized water and organic solvents. The preheated substrate temperature was varied between 450 and 530° C. High quality SnO2: F films were grown at all the substrate temperatures studied. The typical film thickness was 250 nm. XRD shows that the grown films are polycrystalline SnO2 with a tetragonal crystal structure. The average optical transmission of the films was around 93% throughout the wavelength of 400 to 1000 nm. The lowest electrical resistivity achieved was 6 x 10-4 Ω cm. The Hall measurements showed that the film is an n-type semiconductor, with the highest carrier mobility of 8.3 cm2/V.s, and concentration of 1 x 1021 cm-3. The direct band gap was determined to be 4 eV from the transmittance spectrum.

  20. Hydrogen influence on the electrical and optical properties of ZnO thin films grown under different atmospheres

    Energy Technology Data Exchange (ETDEWEB)

    Lorite, I., E-mail: lorite@physik.uni-leipzig; Wasik, J.; Michalsky, T.; Schmidt-Grund, R.; Esquinazi, P.

    2014-04-01

    In this work we studied the changes of the electrical and optical properties after hydrogen plasma treatment of polycrystalline ZnO thin films grown under different atmosphere conditions. The obtained results show that the gas used during the growth process plays an important role in the way hydrogen is incorporated in the films. The hydrogen doping can produce radiative and non-radiative defects that reduce the UV emission in ZnO films grown in oxygen atmosphere but it passivates defects created when the films are grown in nitrogen atmosphere. Impedance spectroscopy measurements show that these effects are related to regions where hydrogen is mostly located, either at the grain cores or boundaries. We discuss how hydrogen strongly influences the initial semiconducting behavior of the ZnO thin films. - Highlights: • Effectiveness of hydrogen treatment depends on the thin film growth conditions. • There is no detection of secondary phases after treatment by IS. • Hydrogen incorporation changes optical and electrical ZnO properties.

  1. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    Science.gov (United States)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  2. CERN Document Server (CDS): Introduction

    CERN Document Server

    CERN. Geneva; Costa, Flavio

    2017-01-01

    A short online tutorial introducing the CERN Document Server (CDS). Basic functionality description, the notion of Revisions and the CDS test environment. Links: CDS Production environment CDS Test environment  

  3. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    S. S. Kushvaha

    2014-02-01

    Full Text Available We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001 substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 108 cm−2 at 750 °C than that of the low temperature grown sample (1.1 × 109 cm−2 at 730 °C. A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  4. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Kushvaha, S. S., E-mail: kushvahas@nplindia.org; Pal, P.; Shukla, A. K.; Joshi, Amish G.; Gupta, Govind; Kumar, M.; Singh, S.; Gupta, Bipin K.; Haranath, D. [CSIR- National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi, India 110012 (India)

    2014-02-15

    We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001) substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 10{sup 8} cm{sup −2} at 750 °C) than that of the low temperature grown sample (1.1 × 10{sup 9} cm{sup −2} at 730 °C). A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  5. Nonequilibrium critical behavior of magnetic thin films grown in a temperature gradient

    Science.gov (United States)

    Candia, Julián; Albano, Ezequiel V.

    2012-08-01

    We investigate the irreversible growth of (2 + 1)-dimensional magnetic thin films under the influence of a transverse temperature gradient, which is maintained by thermal baths across a direction perpendicular to the direction of growth. Therefore, different longitudinal layers grow at different temperatures between T1 and T2, where {T}_{1}\\lt {T}_{{c}}^{{hom}}\\lt {T}_{2} and {T}_{{c}}^{{hom}}=0.6 9(1) is the critical temperature of films grown in homogeneous thermal baths. We find a far-from-equilibrium continuous order-disorder phase transition driven by the thermal bath gradient. We characterize this gradient-induced critical behavior by means of standard finite-size scaling procedures, which lead to the critical temperature Tc = 0.84(2) and a new universality class consistent with the set of critical exponents ν = 3/2, γ = 5/2, and β = 1/4. In order to gain further insight into the effects of the temperature gradient, we also develop a bond model that captures the magnetic film’s growth dynamics. Our findings show that the interplay of geometry and thermal bath asymmetries leads to growth bond flux asymmetries and the onset of transverse ordering effects that explain qualitatively the shift observed in the critical temperature. The relevance of these mechanisms is further confirmed by a finite-size scaling analysis of the interface width, which shows that the growing sites of the system define a self-affine interface.

  6. Low-temperature, vapor-liquid-solid, laterally grown silicon films using alloyed catalysts

    Science.gov (United States)

    LeBoeuf, Jerome L.; Brodusch, Nicolas; Gauvin, Raynald; Quitoriano, Nathaniel J.

    2014-12-01

    Using amorphous oxide templates known as micro-crucibles which confine a vapor-liquid-solid catalyst to a specific geometry, two-dimensional silicon thin-films of a single orientation have been grown laterally over an amorphous substrate and defects within crystals have been necked out. The vapor-liquid-solid catalysts consisted nominally of 99% gold with 1% titanium, chromium, or aluminum, and each alloy affected the processing of micro-crucibles and growth within them significantly. It was found that chromium additions inhibited the catalytic effect of the gold catalysts, titanium changed the morphology of the catalyst during processing and aluminum stabilized a potential third phase in the gold-silicon system upon cooling. Two mechanisms for growing undesired nanowires were identified both of which hindered the VLS film growth, fast silane cracking rates and poor gold etching, which left gold nanoparticles near the gold-vapor interface. To reduce the silane cracking rates, growth was done at a lower temperature while an engineered heat and deposition profile helped to reduce NWs caused by the second mechanism. Through experimenting with catalyst compositions, the fundamental mechanisms which produce concentration gradients across the gold-silicon alloy within a given micro-crucible have been proposed. Using the postulated mechanisms, micro-crucibles were designed which promote high-quality, single crystal growth of semiconductors.

  7. Electrical properties of GaAsN film grown by chemical beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Nishimura, K. [Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 (Japan)], E-mail: sd05501@toyota-ti.ac.jp; Suzuki, H.; Saito, K.; Ohshita, Y.; Kojima, N.; Yamaguchi, M. [Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 (Japan)

    2007-12-15

    The local vibrational modes (LVMs) observed by Fourier transform infrared (FTIR) spectroscopy in GaAsN films grown by chemical beam epitaxy (CBE) was studied, and the influence of the nitrogen-hydrogen bond (N-H) concentration on the hole concentration was investigated. The absorption peak around 936 cm{sup -1} is suggested to be the second harmonic mode of the substitutional N, N{sub As}, LVM around 469 cm{sup -1}. The absorption peak around 960 cm{sup -1} is suggested to be the wagging mode of the N-H, where the stretch mode is observed around 3098 cm{sup -1}. The hole concentration linearly increases with increasing N-H concentration, and the slope increases with increasing growth temperature. It indicates that the hole concentration in GaAsN film is determined by both the number of the N-H and unknown defect, such as impurities, vacancies, and interstitials. This defect concentration increases with increasing growth temperature, suggesting that it is determined by Arrhenius type reaction.

  8. Effect of residual stress on the microstructure of GaN epitaxial films grown by pulsed laser deposition

    Science.gov (United States)

    Wang, Haiyan; Wang, Wenliang; Yang, Weijia; Zhu, Yunnong; Lin, Zhiting; Li, Guoqiang

    2016-04-01

    The stress-free GaN epitaxial films have been directly grown by pulsed laser deposition (PLD) at 850 °C, and the effect of different stress on the microstructure of as-grown GaN epitaxial films has been explored in detail. The as-grown stress-free GaN epitaxial films exhibit very smooth surface without any particles and grains, which is confirmed by the smallest surface root-mean-square roughness of 2.3 nm measured by atomic force microscopy. In addition, they also have relatively high crystalline quality, which is proved by the small full-width at half maximum values of GaN(0002) and GaN (10 1 bar 2) X-ray rocking curves as 0.27° and 0.68°, respectively. However, when the growth temperature is lower or higher than 850 °C, internal or thermal stress would be increased in as-grown GaN epitaxial films. To release the larger stress, a great number of dislocations are generated. Many irregular particulates, hexagonal GaN gains and pits are therefore produced on the films surface, and the crystalline quality is greatly reduced consequently. This work has demonstrated the direct growth of stress-free GaN epitaxial films with excellent surface morphology and high crystalline quality by PLD, and presented a comprehensive study on the origins and the effect of stress in GaN layer. It is instructional to achieve high-quality nitride films by PLD, and shows great potential and broad prospect for the further development of high-performance GaN-based devices.

  9. Structural characteristics of single crystalline GaN films grown on (111) diamond with AlN buffer

    DEFF Research Database (Denmark)

    Pécz, Béla; Tóth, Lajos; Barna, Árpád;

    2013-01-01

    Hexagonal GaN films with the [0001] direction parallel to the surface normal were grown on (111) oriented single crystalline diamond substrates by plasma-assisted molecular beam epitaxy. Pre-treatments of the diamond surface with the nitrogen plasma beam, prior the nucleation of a thin AlN layer,...

  10. An investigation of structural properties of GaN films grown on patterned sapphire substrates by MOVPE

    Science.gov (United States)

    Törmä, P. T.; Ali, M.; Svensk, O.; Sintonen, S.; Kostamo, P.; Suihkonen, S.; Sopanen, M.; Lipsanen, H.; Odnoblyudov, M. A.; Bougrov, V. E.

    2009-12-01

    GaN films were fabricated by metal organic vapor phase epitaxy (MOVPE) on patterned sapphire substrates (PSSs) with either direct or inverse type patterned structures. Both of these two types of PSSs had their own unique GaN growth process which depart from the standard growth on the planar c-plane. GaN films on PSSs showed decreased threading dislocation (TD) density. However, differences between the crystal quality of the GaN films grown on PSSs were observed. It was also found out with one of the pattern type that the TD density varied laterally and followed the periodicity of the pattern on the sapphire surface.

  11. Laser MBE-grown yttrium iron garnet films on GaN: characterization of the crystal structure and magnetic properties

    Science.gov (United States)

    Kaveev, A. K.; Bursian, V. E.; Gastev, S. V.; Krichevtsov, B. B.; Suturin, S. M.; Volkov, M. P.; Sokolov, N. S.

    2016-07-01

    Yttrium iron garnet (YIG) films were grown on GaN substrates using the laser molecular beam epitaxy method. X-ray diffraction data showed polycrystalline YIG layers without additional structural modifications. The magnetic properties of the YIG films were studied at room temperature with the aid of a vibration sample magnetometer, the magneto-optical Kerr effect and ferromagnetic resonance methods. ‘Easy-plane’-type magnetic anisotropy was found in the films. The gyromagnetic ratio and 4 πMS value were calculated.

  12. Effect of acetylene flow rate on morphology and structure of carbon nanotube thick films grown by thermal chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    CAO Zhangyi; SUN Zhuo; GUO Pingsheng; CHEN Yiwei

    2007-01-01

    Carbon nanotube (CNT) films were grown on nickel foil substrates by thermal chemical vapor deposition (CVD) with acetylene and hydrogen as the precursors. The morphology and structure of CNTs depending on the acetylene flow rate were characterized by a scanning electron microscope (SEM),a transmission electron microscope (TEM) and a Raman spectrometer,respectively.The effect of acetylene flow rate on the morphology and structure of CNT films was investigated.By increasing the acetylene flow rate from 10 to 90 sccm (standard cubic centimeter perminute),the yield and the diameter of CNTs increase.Also, the defects and amorphous phase in CNT films increase with increasing acetylene flow rate.

  13. Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition

    Energy Technology Data Exchange (ETDEWEB)

    Shetty, A.R.; Karimi, A. [Institut de Physique de la Matiere Condensee (IPMC), Ecole Polytechnique Federale de Lausanne (EPFL), Lausanne (Switzerland)

    2012-08-15

    In order to understand the texture formation mechanism in thin films grown under oblique angle deposition (OAD), TiAlN films were deposited at room temperature (RT) under various incident angles. We show that both in-plane and out-of-plane crystallographic orientations respond strongly to the deposition angle. For {alpha} = 0 , the pole figures show a (111) and (200) mixed out-of-plane orientation with random in-plane alignment. In contrast, under OAD, inclined textures are observed with the (111) direction moving toward the incident flux direction and the (200) moving away, showing substantial in-plane alignment. This observation suggests that TiAlN crystals prefer to grow with the (200) direction perpendicular to the substrate while maintaining the minimization of the surface free energy by maximizing the (111) surface area toward the incident flux. The in-plane texture, which is randomly oriented at normal incidence, gives rise to two preferred orientations under oblique angles - one along the direction of flux and other away from the deposition source. The biaxial texture results from a competition among texture mechanism related to surface mobilities of adatoms, geometrical and directional effects. The surface and cross-section of the films were observed by scanning electron microscopy (SEM). OAD films develop a kind of smooth tiles of a roof structure, with no faceted crystallites. The columns of these films were tilted toward the direction of incident flux. The dependence of (111) texture tilt angle and column angle {beta} on the incidence flux angle {alpha} is evaluated using four well-known models. Transmission electron microscopy (TEM) study reveals a voided, intercolumnar structure with oblique growth toward the flux direction. The selected area diffraction pattern (SAED) pattern supports the pole figure observations. Measurements of the nanoindentation test were performed in order to discuss the change of mechanical properties as a function of incident

  14. Investigations of the drift mobility of carriers and density of states in nanocrystalline CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Baljinder [Department of Physics, Kurukshetra University, Kurukshetra 136119 (India); Department of Physics, Panjab University, Chandigarh 160014 (India); Singh, Janpreet; Kaur, Jagdish [Department of Physics, Panjab University, Chandigarh 160014 (India); Moudgil, R.K. [Department of Physics, Kurukshetra University, Kurukshetra 136119 (India); Tripathi, S.K., E-mail: surya@pu.ac.in [Department of Physics, Panjab University, Chandigarh 160014 (India)

    2016-06-01

    Nanocrystalline Cadmium Sulfide (nc-CdS) thin films have been prepared on well-cleaned glass substrate at room temperature (300 K) by thermal evaporation technique using inert gas condensation (IGC) method. X-ray diffraction (XRD) analysis reveals that the films crystallize in hexagonal structure with preferred orientation along [002] direction. Scanning electron microscope (SEM) and Transmission electron microscope (TEM) studies reveal that grains are spherical in shape and uniformly distributed over the glass substrates. The optical band gap of the film is estimated from the transmittance spectra. Electrical parameters such as Hall coefficient, carrier type, carrier concentration, resistivity and mobility are determined using Hall measurements at 300 K. Transit time and mobility are estimated from Time of Flight (TOF) transient photocurrent technique in gap cell configuration. The measured values of electron drift mobility from TOF and Hall measurements are of the same order. Constant Photocurrent Method in ac-mode (ac-CPM) is used to measure the absorption spectra in low absorption region. By applying derivative method, we have converted the measured absorption data into a density of states (DOS) distribution in the lower part of the energy gap. The value of Urbach energy, steepness parameter and density of defect states have been calculated from the absorption and DOS spectra.

  15. A comparative study of physico-chemical properties of CBD and SILAR grown ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Jambure, S.B.; Patil, S.J.; Deshpande, A.R.; Lokhande, C.D., E-mail: l_chandrakant@yahoo.com

    2014-01-01

    Graphical abstract: Schematic model indicating ZnO nanorods by CBD (Z{sub 1}) and nanograins by SILAR (Z{sub 2}). - Highlights: • Simple methods for the synthesis of ZnO thin films. • Comparative study of physico-chemical properties of ZnO thin films prepared by CBD and SILAR methods. • CBD outperforms SILAR method. - Abstract: In the present work, nanocrystalline zinc oxide (ZnO) thin films have been successfully deposited onto glass substrates by simple and economical chemical bath deposition (CBD) and successive ionic layer adsorption reaction (SILAR) methods. These films were further characterized for their structural, optical, surface morphological and wettability properties. The X-ray diffraction (XRD) patterns for both CBD and SILAR deposited ZnO thin films reveal the highly crystalline hexagonal wurtzite structure. From optical studies, band gaps obtained are 2.9 and 3.0 eV for CBD and SILAR deposited thin films, respectively. The scanning electron microscope (SEM) patterns show growth of well defined randomly oriented nanorods and nanograins on the CBD and SILAR deposited samples, respectively. The resistivity of CBD deposited films (10{sup 2} Ω cm) is lower than that of SILAR deposited films (10{sup 5} Ω cm). Surface wettability studies show hydrophobic nature for both films. From the above results it can be concluded that CBD grown ZnO thin films show better properties as compared to SILAR method.

  16. Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Stolz, A. [Institut d' Electronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, PRES Lille, Université Nord de France, Avenue Poincaré, 59652 Villeneuve d' Ascq Cedex (France); Soltani, A., E-mail: ali.soltani@iemn.univ-lille1.fr [Institut d' Electronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, PRES Lille, Université Nord de France, Avenue Poincaré, 59652 Villeneuve d' Ascq Cedex (France); Abdallah, B. [Department of Materials Physics, Atomic Energy Commission of Syria, Damascus, P.O. Box 6091 (Syrian Arab Republic); Charrier, J. [Fonctions Optiques pour les Technologies de l' informatiON (FOTON), UMR CNRS 6082, 6, rue de Kerampont CS 80518, 22305 Lannion Cedex (France); Deresmes, D. [Institut d' Electronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, PRES Lille, Université Nord de France, Avenue Poincaré, 59652 Villeneuve d' Ascq Cedex (France); Jouan, P.-Y.; Djouadi, M.A. [Institut des Matériaux Jean Rouxel – IMN, UMR CNRS 6502, 2, rue de la Houssinère BP 32229, 44322 Nantes (France); Dogheche, E.; De Jaeger, J.-C. [Institut d' Electronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, PRES Lille, Université Nord de France, Avenue Poincaré, 59652 Villeneuve d' Ascq Cedex (France)

    2013-05-01

    Low-temperature Aluminum Nitride (AlN) thin films with a thickness of 3 μm were deposited by Direct-Current magnetron sputtering on sapphire substrate. They present optical properties similar to those of epitaxially grown films. Different characterization methods such as X-Ray Diffraction, Transmission Electron Microscopy and Atomic Force Microscopy were used to determine the structural properties of the films such as its roughness and crystallinity. Newton interferometer was used for stress measurement of the films. Non-destructive prism-coupling technique was used to determine refractive index and thickness homogeneity by a mapping on the whole sample area. Results show that AlN films grown on AlGaN layer have a high crystallinity close to epitaxial films, associated to a low intrinsic stress for low thickness. These results highlight that it is possible to grow thick sample with microstructure and optical properties close to epitaxy, even on a large surface. - Highlights: ► Aluminum Nitride sputtering technique with a low temperature growth process ► Epitaxial quality of two microns sputtered Aluminum Nitride film ► Optics as a non-destructive accurate tool for acoustic wave investigation.

  17. Morphology and Optical Properties of Zinc Oxide Films Grown on Metal Coated Glass Substrates by Aqueous Chemical Growth

    Science.gov (United States)

    Bakar, M. A.; Hamid, M. A. A.; Jalar, A.; Shamsudin, R.

    2013-04-01

    Zinc oxide films were deposited on three different metal coated substrates (gold, nickel and platinum) by aqueous chemical growth method. This paper discusses the effect of metal coated substrates on the morphology and optical properties of grown ZnO films. X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM) and UV-visible spectroscopy (UV-vis) were employed to characterize the samples. All the as-deposited ZnO films exhibit crystalline hexagonal wurzite structure. The crystallite size of the ZnO films were in the range of 29 to 32 nm. FESEM micrographs revealed hexagonal rod, oval-like and flower-like ZnO structures formed on all metal coated substrates. The Pt coated film contains higher density hexagonal rod as compared to others metal coated substrate. Most probably the Pt lattice parameter is the nearest to ZnO compared to nickel and gold. The optical band gap energy, Eg of ZnO films were estimated to be 3.30 eV which is near to bulk Eg, 3.37 eV. This indicates that the ZnO grown by aqueous chemical growth is able to produce similar quality properties to other conventional method either films or bulk size.

  18. N-doped ZnO films grown from hybrid target by the pulsed laser deposition technique

    Science.gov (United States)

    Martín-Tovar, E. A.; Chan y Díaz, E.; Acosta, M.; Castro-Rodríguez, R.; Iribarren, A.

    2016-10-01

    ZnO thin films were grown by the pulsed laser deposition technique on glass substrate using a hybrid target composed of ZnO powder embedded into a poly(ethyl cyanoacrylate) matrix. The resulting thin film presented ZnO wurtzite structure with very low stress and diffractogram very similar to that of the powder pattern. From comparing with ZnO thin films grown from traditional sintered target, it is suggested that the use of this hybrid target with a soft matrix led to ejection of ZnO clusters that conveniently disposed and adhered to substrate and previous deposited layers. Chemical measurements showed the presence of Zn-N bonds, besides Zn-O ones. Optical absorption profile confirmed the presence of low-polymerized zinc oxynitride molecular subunits, besides ZnO.

  19. UV/vis range photodetectors based on thin film ALD grown ZnO/Si heterojunction diodes

    Science.gov (United States)

    Alkis, Sabri; Tekcan, Burak; Nayfeh, Ammar; Kemal Okyay, Ali

    2013-10-01

    We present ultraviolet-visible (UV/vis) range photodetectors (PDs) based on thin film ZnO (n)/Si (p) heterojunction diodes. ZnO films are grown by the atomic layer deposition (ALD) technique at growth temperatures of 80, 150, 200 and 250 ° C. The fabricated ZnO (n)/Si (p) photodetectors (ZnO-Si-PDs) show good electrical rectification characteristics with ON/OFF ratios reaching up to 103. Under UV (350 nm wavelength) and visible (475 nm wavelength) light illumination, the ZnO-Si-PDs give photoresponsivity values of 30-37 mA W-1 and 74-80 mA W-1 at 0.5 V reverse bias, respectively. Photoluminescence (PL) spectra of ALD grown ZnO thin films are used to support the results.

  20. Nanomechanical properties of SiC films grown from C{sub 60} precursors using atomic force microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Morse, K. [Colorado School of Mines, Golden, CO (United States); Balooch, M.; Hamza, A.V.; Belak, J. [Lawrence Livermore National Lab., CA (United States)

    1994-12-01

    The mechanical properties of SiC films grown via C{sub 60} precursors were determined using atomic force microscopy (AFM). Conventional silicon nitride and modified diamond cantilever AFM tips were employed to determine the film hardness, friction coefficient, and elastic modulus. The hardness is found to be between 26 and 40 GPa by nanoindentation of the film with the diamond tip. The friction coefficient for the silicon nitride tip on the SiC film is about one third that for silicon nitride sliding on a silicon substrate. By combining nanoindentation and AFM measurements an elastic modulus of {approximately}300 GPa is estimated for these SiC films. In order to better understand the atomic scale mechanisms that determine the hardness and friction of SiC, we simulated the molecular dynamics of a diamond indenting a crystalline SiC substrate.

  1. Self-organized single crystal mixed magnetite/cobalt ferrite films grown by infrared pulsed-laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Figuera, Juan de la, E-mail: juan.delafiguera@iqfr.csic.es [Instituto de Química Física “Rocasolano”, CSIC, Madrid E-28006 (Spain); Quesada, Adrián [Instituto de Cerámica y Vidrio, CSIC, Madrid E-28049 (Spain); Martín-García, Laura; Sanz, Mikel; Oujja, Mohamed; Rebollar, Esther; Castillejo, Marta [Instituto de Química Física “Rocasolano”, CSIC, Madrid E-28006 (Spain); Prieto, Pilar; Muñoz-Martín, Ángel [Universidad Autónoma de Madrid, E-28049 (Spain); Aballe, Lucía [Alba Synchrotron Light Facility, CELLS, Barcelona (Spain); Marco, José F. [Instituto de Química Física “Rocasolano”, CSIC, Madrid E-28006 (Spain)

    2015-12-30

    Highlights: • Infrared pulsed deposition is used to grow single crystal mixed magnetite-cobalt ferrite films. • Distinct topography with two mound types on the surface of the film. • Suggested origin of segregation into two phases is oxygen deficiency during growth. • Mössbauer is required to quantify the two components. - Abstract: We have grown mixed magnetite/cobalt ferrite epitaxial films on SrTiO{sub 3} by infrared pulsed-laser deposition. Diffraction experiments indicate epitaxial growth with a relaxed lattice spacing. The films are flat with two distinct island types: nanometric rectangular mounds in two perpendicular orientations, and larger square islands, attributed to the two main components of the film as determined by Mössbauer spectroscopy. The origin of the segregation is suggested to be the oxygen-deficiency during growth.

  2. LiCoO{sub 2} thin films grown by pulsed laser deposition on low cost substrates

    Energy Technology Data Exchange (ETDEWEB)

    Ginley, D.S.; Perkins, J.D.; McGraw, J.M.; Parilla, P.A.

    1998-07-01

    The authors report on the use of pulsed laser deposition (PLD) to grow thin films of LiCoO{sub 2} on a number of low cost substrates including SnO{sub 2} coated Upilex, stainless steel and SnO{sub 2} coated glass. Highly textured (001) films grown on CVD deposited SnO{sub 2} films on 7059 glass, were obtained at 200 to 500 mTorr O{sub 2} and a temperature of 500 C. Similar texture was not obtained on the stainless or Upilex however dense films from crystalline to amorphous were obtained. The films were characterized by x-ray diffraction and Raman spectroscopy.

  3. ALD grown nanostructured ZnO thin films: Effect of substrate temperature on thickness and energy band gap

    Directory of Open Access Journals (Sweden)

    Javed Iqbal

    2016-10-01

    Full Text Available Nanostructured ZnO thin films with high transparency have been grown on glass substrate by atomic layer deposition at various temperatures ranging from 100 °C to 300 °C. Efforts have been made to observe the effect of substrate temperature on the thickness of the deposited thin films and its consequences on the energy band gap. A remarkably high growth rate of 0.56 nm per cycle at a substrate temperature of 200 °C for ZnO thin films have been achieved. This is the maximum growth rate for ALD deposited ZnO thin films ever reported so far to the best of our knowledge. The studies of field emission scanning electron microscopy and X-ray diffractometry patterns confirm the deposition of uniform and high quality nanosturtured ZnO thin films which have a polycrystalline nature with preferential orientation along (100 plane. The thickness of the films deposited at different substrate temperatures was measured by ellipsometry and surface profiling system while the UV–visible and photoluminescence spectroscopy studies have been used to evaluate the optical properties of the respective thin films. It has been observed that the thickness of the thin film depends on the substrate temperatures which ultimately affect the optical and structural parameters of the thin films.

  4. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    Energy Technology Data Exchange (ETDEWEB)

    Li, Wei, E-mail: weili.unsw@gmail.com; Varlamov, Sergey; Xue, Chaowei

    2014-09-30

    Highlights: • Crystallisation kinetic is used to analyse seed layer surface cleanliness. • Simplified RCA cleaning for the seed layer can shorten the epitaxy annealing duration. • RTA for the seed layer can improve the quality for both seed layer and epi-layer. • Epitaxial poly-Si solar cell performance is improved by RTA treated seed layer. - Abstract: This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, V{sub oc} and J{sub sc} than the one on the seed layer without RTA treatment.

  5. Characterization of oxynitride dielectric films grown in NO/O{sub 2} mixtures by rapid thermal oxynitridation

    Energy Technology Data Exchange (ETDEWEB)

    EVERIST,SARAH C.; MEISENHEIMER,TIMOTHY L.; NELSON,GERALD C.; SMITH,PAUL M.

    2000-02-29

    Ultra-thin oxynitride films were grown on Si by direct rapid thermal processing (RTP) oxynitridation in NO/O{sub 2} ambients with NO concentrations from 5% to 50%. During oxynitridation, nitrogen accumulated at the Si/dielectric interface and the average concentration of in N through the resulting films ranged from 0.3 to 3.0 atomic percent. The average concentration of N in the films increased with increasing NO in the ambient gas, but decreased with longer RTP times. The maximum N concentration remained relatively constant for all RTP times and a given NO/O{sub 2} ambient. Re-oxidation following oxynitridation altered L the N profile and improved the electrical characteristics, with an optimal NO/O{sub 2} mixture in the range of 10% to 25% NO. Re-oxidation by RTP improves the electrical characteristics with respect to the films that were not re-oxidized and produces only slight changes in the N distribution or maximum concentration. The electrical results also indicate that oxynitride films are superior to comparably grown oxide films.

  6. Annealing Effect on the Structural and Optical Properties of Sputter-Grown Bismuth Titanium Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    José E. Alfonso

    2014-04-01

    Full Text Available The aim of this work is to assess the evolution of the structural and optical properties of BixTiyOz films grown by rf magnetron sputtering upon post-deposition annealing treatments in order to obtain good quality films with large grain size, low defect density and high refractive index similar to that of single crystals. Films with thickness in the range of 220–250 nm have been successfully grown. After annealing treatment at 600 °C the films show excellent transparency and full crystallization. It is shown that to achieve larger crystallite sizes, up to 17 nm, it is better to carry the annealing under dry air than under oxygen atmosphere, probably because the nucleation rate is reduced. The refractive index of the films is similar under both atmospheres and it is very high (n =2.5 at 589 nm. However it is still slightly lower than that of the single crystal value due to the polycrystalline morphology of the thin films.

  7. Investigation of bonded hydrogen defects in nanocrystalline diamond films grown with nitrogen/methane/hydrogen plasma at high power conditions

    Science.gov (United States)

    Tang, C. J.; Hou, Haihong; Fernandes, A. J. S.; Jiang, X. F.; Pinto, J. L.; Ye, H.

    2017-02-01

    In this work, we investigate the influence of some growth parameters such as high microwave power ranging from 3.0 to 4.0 kW and N2 additive on the incorporation of bonded hydrogen defects in nanocrystalline diamond (NCD) films grown through a small amount of pure N2 addition into conventional 4% CH4/H2 plasma using a 5 kW microwave plasma CVD system. Incorporation form and content of hydrogen point defects in the NCD films produced with pure N2 addition was analyzed by employing Fourier-transform infrared (FTIR) spectroscopy for the first time. A large amount of hydrogen related defects was detected in all the produced NCD films with N2 additive ranging from 29 to 87 μm thick with grain size from 47 nm to 31 nm. Furthermore, a specific new H related sharp absorption peak appears in all the NCD films grown with pure N2/CH4/H2 plasma at high powers and becomes stronger at powers higher than 3.0 kW and is even stronger than the 2920 cm-1 peak, which is commonly found in CVD diamond films. Based on these experimental findings, the role of high power and pure nitrogen addition on the growth of NCD films including hydrogen defect formation is analyzed and discussed.

  8. Thickness dependence of critical current density in MgB{sub 2} films fabricated by ex situ annealing of CVD-grown B films in Mg vapor

    Energy Technology Data Exchange (ETDEWEB)

    Hanna, Mina; Salama, Kamel [Department of Mechanical Engineering and Texas Center for Superconductivity, University of Houston, Houston, TX 77204 (United States); Wang, Shufang; Xi, X X [Department of Physics, Pennsylvania State University, University Park, PA 16801 (United States); Redwing, Joan M [Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16801 (United States)], E-mail: ksalama@uh.edu

    2009-01-15

    A study was performed to examine the J{sub c} behavior as a function of thickness in MgB{sub 2} films fabricated by ex situ annealing at 840 deg. C of boron films, grown by chemical vapor deposition, in Mg vapor. The film thicknesses range between 300 nm and 10 {mu}m. The values of J{sub c} range from 1.2 x 10{sup 7} A cm{sup -2} for 300 nm to 1.9 x 10{sup 5} A cm{sup -2} for 10 {mu}m film thicknesses at 20 K and self-field. The study shows that the critical current density (J{sub c}) in MgB{sub 2} films decreases with increasing film thickness, similar to that observed in YBCO-coated conductors. Moreover, our study shows that critical current (I{sub c}) reaches its maximum value of 728 A cm{sup -1} width at {approx}1 {mu}m thick MgB{sub 2} films at 20 K and self-field, which is, interestingly, the same thickness of pulsed-laser-deposited YBCO-coated conductors at which I{sub c} reaches its maximum value. The high J{sub c} values carried by our films show that the ex situ fabrication method can produce high quality MgB{sub 2} films at low processing temperatures, which is promising for RF cavity applications and coated-conductor wires and tapes.

  9. Influence of substrate on structural, morphological and optical properties of ZnO films grown by SILAR method

    Indian Academy of Sciences (India)

    F N Jiménez-García; C L Londoño-Calderón; D G Espinosa-Arbeláez; A Del Real; M E Rodríguez-García

    2014-10-01

    ZnO films were obtained by successive ionic layer adsorption and reaction (SILAR) method from four different substrates: glass microslides, corning glass, quartz and silicon with and without oxide layer. For films deposition, a precursor solution of ZnSO4 was used, complexed with ammonium hydroxide. Prior to the film deposition, wettability of the substrates was analysed using a CCD camera. It was found that the Si without the oxide layer substrate shows hydrophobic behaviour, which makes the films less adherent and not uniform, while in the other substrates, the behaviour was optimal for the growing process. ZnO films grown on glass microslides, corning glass, quartz and Si with oxide layer were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–Vis techniques. According to the XRD patterns, the films were polycrystalline, with hexagonal wurtzite structure and the patterns mentioned showed significant differences in crystallite sizes, microstrain and texture coefficient with respect to the employed substrates. The morphology of the ZnO films constituted by rice-like and flower-like structures shows differences in form and size depending on the substrate. The UV–Vis spectroscopy results show that the substrate did not influence the band gap energy value obtained from films.

  10. Graphene films grown on sapphire substrates via solid source molecular beam epitaxy

    Institute of Scientific and Technical Information of China (English)

    Tang Jun; Kang Chao-Yang; Li Li-Min; Liu Zhong-Liang; Yan Wen-Sheng; Wei Shi-Qiang; Xu Peng-Shou

    2012-01-01

    A method for growing graphene on a sapphire substrate by depositing an SiC buffer layer and then annealing at high temperature in solid source molecular beam epitaxy(SSMBE)equipment was presented.The structural and electronic properties of the samples were characterized by reflection high energy diffraction(RHEED),X-ray diffractionφ scans,Raman spectroscopy,and near edge X-ray absorption fine structure(NEXAFS)spectroscopy.The results of the RHEED and φ scan,as well as the Raman spectra,showed that an epitaxial hexagonal α-SiC layer was grown on the sapphire substrate.The results of the Raman and NEXAFS spectra revealed that the graphene films with the AB Bernal stacking structure were formed on the sapphire substrate after annealing.The layer number of the graphene was between four and five,and the thickness of the unreacted SiC layer was about 1-1.5 mm.

  11. Superconducting YBa sub 2 Cu sub 3 O sub 7 thin films grown in-situ by ion beam CO-deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kellett, B.K.; James, J.H.; Gauzzi, A.; Dwir, B.; Pavuna, D. (Inst. of Micro and Optoelectronics, Dept. of Physics, Federal Inst. of Tech., Lausanne (Switzerland))

    1989-12-01

    Superconducting YBCO thin films have been grown in-situ by three ion beam co-deposition sputtering. Both metal and oxide targets of Cu and Y and BaF{sub 2} and BaCO{sub 3} targets have been investigated. Film composition was determined by RBS and AES analysis. Films grown using BaF{sub 2} show fluorine contamination, whereas the carbon concentration in films grown using BaCO{sub 3} is beneath the Auger detection limit. Superconducting films have been grown on SrTiO{sub 3} (T{sub co}=78K) and on Si with SiO{sub 2} or Y{sub 2}O{sub 3} buffer layers (T{sub co}=35K). (orig.).

  12. Transferring MBE-grown topological insulator films to arbitrary substrates and metal-insulator transition via Dirac gap.

    Science.gov (United States)

    Bansal, Namrata; Cho, Myung Rae; Brahlek, Matthew; Koirala, Nikesh; Horibe, Yoichi; Chen, Jing; Wu, Weida; Park, Yun Daniel; Oh, Seongshik

    2014-03-12

    Mechanical exfoliation of bulk crystals has been widely used to obtain thin topological insulator (TI) flakes for device fabrication. However, such a process produces only microsized flakes that are highly irregular in shape and thickness. In this work, we developed a process to transfer the entire area of TI Bi2Se3 thin films grown epitaxially on Al2O3 and SiO2 to arbitrary substrates, maintaining their pristine morphology and crystallinity. Transport measurements show that these transferred films have lower carrier concentrations and comparable or higher mobilities than before the transfer. Furthermore, using this process we demonstrated a clear metal-insulator transition in an ultrathin Bi2Se3 film by gate-tuning its Fermi level into the hybridization gap formed at the Dirac point. The ability to transfer large area TI films to any substrate will facilitate fabrication of TI heterostructure devices, which will help explore exotic phenomena such as Majorana fermions and topological magnetoelectricity.

  13. Epitaxial Properties of Co-Doped ZnO Thin Films Grown by Plasma Assisted Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    CAO Qiang; DENG Jiang-Xia; LIU Guo-Lei; CHEN Yan-Xue; YAN Shi-Shen

    2007-01-01

    High quality Co-doped ZnO thin films are grown on single crystalline Al2O3(0001) and ZnO(0001) substrates by oxygen plasma assisted molecular beam epitaxy at a relatively lower substrate temperature of 450 ℃. The epitaxial conditions are examined with in-situ reflection high energy electron diffraction (RHEED) and ex-situ high resolution x-ray diffraction (HRXRD). The epitaxial thin films are single crystal at film thickness smaller than 500nm and nominal concentration of Co dopant up to 20%. It is indicated that the Co cation is incorporated into the ZnO matrix as Co2+ substituting Zn2+ ions. Atomic force microscopy shows smooth surfaces with rms roughness of 1.9nm. Room-temperature magnetization measurements reveal that the Co-doped ZnO thin films are ferromagnetic with Curie temperatures TC above room temperature.

  14. Immobilization of carbon nanotubes on functionalized graphene film grown by chemical vapor deposition and characterization of the hybrid material

    Directory of Open Access Journals (Sweden)

    Prashanta Dhoj Adhikari

    2014-01-01

    Full Text Available We report the surface functionalization of graphene films grown by chemical vapor deposition and fabrication of a hybrid material combining multi-walled carbon nanotubes and graphene (CNT–G. Amine-terminated self-assembled monolayers were prepared on graphene by the UV-modification of oxidized groups introduced onto the film surface. Amine-termination led to effective interaction with functionalized CNTs to assemble a CNT–G hybrid through covalent bonding. Characterization clearly showed no defects of the graphene film after the immobilization reaction with CNT. In addition, the hybrid graphene material revealed a distinctive CNT–G structure and p–n type electrical properties. The introduction of functional groups on the graphene film surface and fabrication of CNT–G hybrids with the present technique could provide an efficient, novel route to device fabrication.

  15. Etch Pits and Threading Dislocations in GaN Films Grown by Metal-Organic Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    陆敏; 常昕; 黎子兰; 杨志坚; 张国义; 章蓓

    2003-01-01

    High quality epitaxial GaN films on (0001) sapphire substrates were grown by a commercial metal-organic chemical vapour deposition system. The, etch pits and threading dislocations in GaN films is studied by a scanning electron microscope (SEM) and a transmission-electron microscope (TEM). The SEM images of GaN films, etched in mixed acid solution (H3PO4:H2SO4 = 1: 3) and molten KOH exhibit notably different, etching pit densities of 5 × 108/cm2 and 4 × 107/cm2, respectively, which probably indicate that more kinds of, etching pits were revealed when, etched in mixed acid solution (H3PO4:H2SO4 = 1: 3). Cross section TEM of GaN films with different g vectors showed the portions of different threading dislocations. Theoretical calculation indicates that the lattice and thermal expansion coefficient mismatch may be the main origins of pure edge threading dislocations.

  16. Effects of sapphire substrates surface treatment on the ZnO thin films grown by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wang Yinzhen [School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510631 (China)], E-mail: agwyz@yahoo.com.cn; Chu Benli [School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510631 (China)

    2008-06-01

    The surface treatment effects of sapphire substrate on the ZnO thin films grown by magnetron sputtering were studied. The sapphire substrates properties have been investigated by means of atomic force microscopy (AFM) and X-ray diffraction rocking curves (XRCs). The results show that sapphire substrate surfaces have the best quality by CMP with subsequent chemical etching. The surface treatment effects of sapphire substrate on the ZnO thin films were examined by X-ray diffraction (XRD) and photoluminescence (PL) measurements. Results show that the intensity of (0 0 2) diffraction peak of ZnO thin films on sapphire substrates treated by CMP with subsequent chemical etching was strongest, FWHM of (0 0 2) diffraction peak is the narrowest and the intensity of UV peak of PL spectrum is strongest, indicating surface treatment on sapphire substrate preparation may improve ZnO thin films crystal quality and photoluminescent property.

  17. Low-damping sub-10-nm thin films of lutetium iron garnet grown by molecular-beam epitaxy

    Science.gov (United States)

    Jermain, C. L.; Paik, H.; Aradhya, S. V.; Buhrman, R. A.; Schlom, D. G.; Ralph, D. C.

    2016-11-01

    We analyze the structural and magnetic characteristics of (111)-oriented lutetium iron garnet (Lu3Fe5O12) films grown by molecular-beam epitaxy, for films as thin as 2.8 nm. Thickness-dependent measurements of the in- and out-of-plane ferromagnetic resonance allow us to quantify the effects of two-magnon scattering, along with the surface anisotropy and the saturation magnetization. We achieve effective damping coefficients of 11.1 (9 )×10-4 for 5.3 nm films and 32 (3 )×10-4 for 2.8 nm films, among the lowest values reported to date for any insulating ferrimagnetic sample of comparable thickness.

  18. Perpendicular Magnetic Anisotropy and Spin Glass-like Behavior in Molecular Beam Epitaxy Grown Chromium Telluride Thin Films.

    Science.gov (United States)

    Roy, Anupam; Guchhait, Samaresh; Dey, Rik; Pramanik, Tanmoy; Hsieh, Cheng-Chih; Rai, Amritesh; Banerjee, Sanjay K

    2015-04-28

    Reflection high-energy electron diffraction (RHEED), scanning tunneling microscopy (STM), vibrating sample magnetometry, and other physical property measurements are used to investigate the structure, morphology, magnetic, and magnetotransport properties of (001)-oriented Cr2Te3 thin films grown on Al2O3(0001) and Si(111)-(7×7) surfaces by molecular beam epitaxy. Streaky RHEED patterns indicate flat smooth film growth on both substrates. STM studies show the hexagonal arrangements of surface atoms. Determination of the lattice parameter from the atomically resolved STM image is consistent with the bulk crystal structures. Magnetic measurements show the film is ferromagnetic, having a Curie temperature of about 180 K, and a spin glass-like behavior was observed below 35 K. Magnetotransport measurements show the metallic nature of the film with a perpendicular magnetic anisotropy along the c-axis.

  19. Characterization of Al2O3 Thin Films on GaAs Substrate Grown by Atomic Layer Deposition

    Institute of Scientific and Technical Information of China (English)

    LU Hong-Liang; LI Yan-Bo; XU Min; DING Shi-Jin; SUN Liang; ZHANG Wei; WANG Li-Kang

    2006-01-01

    @@ Al2O3 thin films are grown by atomic layer deposition on GaAs substrates at 300℃. The structural properties of the Al2O3 thin film and the Al2O3/GaAs interface are characterized using x-ray diffraction (XRD), highresolution transmission electron microscopy (HRTEM), and x-ray photoelectron spectroscopy (XPS). The XRD results show that the as-deposited Al2O3 film is amorphous. For 30 atomic layer deposition growth cycles, the thicknesses of the Al2O3 thin film and the interface layer from the HRTEM are 3.3nm and 0.5nm, respectively.XPS analyses reveal that the Al2O3/GaAs interface is almost free from As2O3.

  20. Hole-dominated transport in InSb nanowires grown on high-quality InSb films

    Science.gov (United States)

    Algarni, Zaina; George, David; Singh, Abhay; Lin, Yuankun; Philipose, U.

    2016-12-01

    We have developed an effective strategy for synthesizing p-type indium antimonide (InSb) nanowires on a thin film of InSb grown on glass substrate. The InSb films were grown by a chemical reaction between S b 2 S 3 and I n and were characterized by structural, compositional, and optical studies. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) studies reveal that the surface of the substrate is covered with a polycrystalline InSb film comprised of sub-micron sized InSb islands. Energy dispersive X-ray (EDX) results show that the film is stoichiometric InSb. The optical constants of the InSb film, characterized using a variable-angle spectroscopic ellipsometer (VASE) shows a maximum value for refractive index at 3.7 near 1.8 eV, and the extinction coefficient (k) shows a maximum value 3.3 near 4.1 eV. InSb nanowires were subsequently grown on the InSb film with 20 nm sized Au nanoparticles functioning as the metal catalyst initiating nanowire growth. The InSb nanowires with diameters in the range of 40-60 nm exhibit good crystallinity and were found to be rich in Sb. High concentrations of anions in binary semiconductors are known to introduce acceptor levels within the band gap. This un-intentional doping of the InSb nanowire resulting in hole-dominated transport in the nanowires is demonstrated by the fabrication of a p-channel nanowire field effect transistor. The hole concentration and field effect mobility are estimated to be ≈1.3 × 1017 cm-3 and 1000 cm2 V-1 s-1, respectively, at room temperature, values that are particularly attractive for the technological implications of utilizing p-InSb nanowires in CMOS electronics.

  1. Structural, morphological and optical characterizations of ZnO:Al thin films grown on silicon substrates by pulsed laser deposition

    Science.gov (United States)

    Alyamani, A.; Sayari, A.; Albadri, A.; Albrithen, H.; El Mir, L.

    2016-09-01

    The pulsed laser deposition (PLD) technique is used to grow Al-doped ZnO (AZO) thin films at 500 ° C on silicon substrates under vacuum or oxygen gas background from ablating AZO nanoparticle targets synthesized via the sol-gel process. The structural, morphological and optical properties were characterized by using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM) and spectroscopic ellipsometry (SE) techniques. XRD and TEM images show that AZO powder has a wurtzite-type structure and is composed of small prismatic-like shape nanoparticles with an average size of 30nm. The structural properties of the AZO films grown under oxygen show no significant changes compared to those of the film grown under vacuum. However, the optical properties show a dependence on the growth conditions of the AZO films. Highly c -axis-oriented AZO thin films were obtained with grain size ˜ 15 nm. The stress in the AZO films is tensile as measured from the c -parameter. The dielectric function, the refractive index and the extinction coefficient as a function of the photon energy for the AZO films were determined by using spectroscopic ellipsometry measurements in the photon energy region from 1 to 6eV. The band gap energy was observed to slightly decrease in the presence of the O2 gas background and this may be attributed to the stress. The surface and volume energy loss functions are calculated and exhibit different behaviors in the energy range 1-6eV. Refractive indices of 1.9-2.1 in the visible region were obtained for the AZO films. Also, the electronic carrier concentration appears to be related to the presence of O2 during the growth process.

  2. Effects of growth temperature on the properties of atomic layer deposition grown ZrO2 films

    Science.gov (United States)

    Scarel, G.; Ferrari, S.; Spiga, S.; Wiemer, C.; Tallarida, G.; Fanciulli, M.

    2003-07-01

    Zirconium dioxide films are grown in 200 atomic layer deposition cycles. Zirconium tetrachloride (ZrCl4) and water (H2O) are used as precursors. A relatively high dielectric constant (κ=22), wide band gap, and conduction band offset (5.8 and 1.4 eV, respectively) indicate that zirconium dioxide is a most promising substitute for silicon dioxide as a dielectric gate in complementary metal-oxide-semiconductor devices. However, crystallization and chlorine ions in the films might affect their electrical properties. These ions are produced during atomic layer deposition in which the ZrCl4 precursor reacts with the growth surface. It is desirable to tune the composition, morphology, and structural properties in order to improve their benefit on the electrical ones. To address this issue it is necessary to properly choose the growth parameters. This work focuses on the effects of the growth temperature Tg. ZrO2 films are grown at different substrate temperatures: 160, 200, 250, and 350 °C. Relevant modification of the film structure with a change in substrate temperature during growth is expected because the density of reactive sites [mainly Si+1-(OH)-1 bonds] decreases with an increase in temperature [Y. B. Kim et al., Electrochem. Solid-State Lett. 3, 346 (2000)]. The amorphous film component, for example, that develops at Si+1-(OH)-1 sites on the starting growth surface, is expected to decrease with an increase in growth temperature. The size and consequences of film property modifications with the growth temperature are investigated in this work using x-ray diffraction and reflectivity, and atomic force microscopy. Time of flight-secondary ion mass spectrometry is used to study contaminant species in the films. From capacitance-voltage (CV) and current-voltage (IV) measurements, respectively, the dielectric constant κZrO2 and the leakage current are studied as a function of the film growth temperature.

  3. High Stability Electron Field Emitters Synthesized via the Combination of Carbon Nanotubes and N₂-Plasma Grown Ultrananocrystalline Diamond Films.

    Science.gov (United States)

    Chang, Ting-Hsun; Hsieh, Ping-Yen; Kunuku, Srinivasu; Lou, Shiu-Cheng; Manoharan, Divinah; Leou, Keh-Chyang; Lin, I-Nan; Tai, Nyan-Hwa

    2015-12-16

    An electron field emitter with superior electron field emission (EFE) properties and improved lifetime stability is being demonstrated via the combination of carbon nanotubes and the CH4/N2 plasma grown ultrananocrystalline diamond (N-UNCD) films. The resistance of the carbon nanotubes to plasma ion bombardment is improved by the formation of carbon nanocones on the side walls of the carbon nanotubes, thus forming strengthened carbon nanotubes (s-CNTs). The N-UNCD films can thus be grown on s-CNTs, forming N-UNCD/s-CNTs carbon nanocomposite materials. The N-UNCD/s-CNTs films possess good conductivity of σ = 237 S/cm and marvelous EFE properties, such as low turn-on field of (E0) = 3.58 V/μm with large EFE current density of (J(e)) = 1.86 mA/cm(2) at an applied field of 6.0 V/μm. Moreover, the EFE emitters can be operated under 0.19 mA/cm(2) for more than 350 min without showing any sign of degradation. Such a superior EFE property along with high robustness characteristic of these combination of materials are not attainable with neither N-UNCD films nor s-CNTs films alone. Transmission electron microscopic investigations indicated that the N-UNCD films contain needle-like diamond grains encased in a few layers of nanographitic phase, which enhanced markedly the transport of electrons in the N-UNCD films. Moreover, the needle-like diamond grains were nucleated from the s-CNTs without the necessity of forming the interlayer that facilitate the transport of electrons crossing the diamond-to-Si interface. Both these factors contributed to the enhanced EFE behavior of the N-UNCD/s-CNTs films.

  4. Luminescence properties of lanthanide and ytterbium lanthanide titanate thin films grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hansen, Per-Anders, E-mail: p.a.hansen@kjemi.uio.no; Fjellvåg, Helmer; Nilsen, Ola [Department of Chemistry, Centre for Materials Science and Nanotechnology, University of Oslo, Sem Sælandsvei 26, 0371 Oslo (Norway); Finstad, Terje G. [Department of Physics, Centre for Materials Science and Nanotechnology, University of Oslo, Sem Sælandsvei 24, 0371 Oslo (Norway)

    2016-01-15

    Lanthanide based luminescent materials are highly suitable as down conversion materials in combination with a UV-absorbing host material. The authors have used TiO{sub 2} as the UV-absorbing host material and investigated the energy transfer between TiO{sub 2} and 11 different lanthanide ions, Ln{sup 3+} (Ln = La, Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb) in thin films grown by atomic layer deposition. They have also investigated the possibility to improve the overall energy transfer from TiO{sub 2} to Yb{sup 3+} with a second Ln{sup 3+}, in order to enhance down conversion. The films were grown at a substrate temperature of 300 °C, using the Ln(thd){sub 3}/O{sub 3} (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) and TiCl{sub 4}/H{sub 2}O precursor pairs. The focus of the work is to explore the energy transfer from TiO{sub 2} to Ln{sup 3+} ions, and the energy transfer between Ln{sup 3+} and Yb{sup 3+} ions, which could lead to efficient down conversion. The samples have been characterized by x-ray diffraction, x-ray fluorescence, spectroscopic ellipsometry, and photoluminescence. All films were amorphous as deposited, and the samples have been annealed at 600, 800, and 1000 °C in order to investigate the correlation between the crystallinity and luminescence. The lanthanum titanium oxide samples showed a weak and broad emission centered at 540 nm, which was absent in all the other samples, indicating energy transfer from TiO{sub 2} to Ln{sup 3+} in all other lanthanide samples. In the amorphous phase, all samples, apart from La, Tb, and Tm, showed a typical f-f emission when excited by a 325 nm HeCd laser. None of the samples showed any luminescence after annealing at 1000 °C due to the formation of Ln{sub 2}Ti{sub 2}O{sub 7}. Samples containing Nd, Sm, and Eu show a change in emission spectrum when annealed at 800 °C compared to the as-deposited samples, indicating that the smaller lanthanides crystallize in a different manner than the larger

  5. Structural, morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

    Science.gov (United States)

    Siddiqui, Jamil; Hussain, Tousif; Ahmad, Riaz; Umar, Zeeshan A.; Abdus Samad, Ubair

    2016-05-01

    The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10 cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10 cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4 ± 0.4 GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10 cm axial distance with 15 PFS.

  6. Modification of optical and electrical properties of chemical bath deposited CdS using plasma treatments

    Energy Technology Data Exchange (ETDEWEB)

    Gonzalez, G. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); Krishnan, B. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); CIIDIT, Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico); Avellaneda, D.; Castillo, G. Alan; Das Roy, T.K. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); Shaji, S., E-mail: sshajis@yahoo.com [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P 66450 (Mexico); CIIDIT, Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico)

    2011-08-31

    Cadmium sulphide (CdS) is a well known n-type semiconductor that is widely used in solar cells. Here we report preparation and characterization of chemical bath deposited CdS thin films and modification of their optical and electrical properties using plasma treatments. CdS thin films were prepared from a chemical bath containing Cadmium chloride, Triethanolamine and Thiourea under various deposition conditions. Good quality thin films were obtained during deposition times of 5, 10 and 15 min. CdS thin films prepared for 10 min. were treated using a glow discharge plasma having nitrogen and argon carrier gases. The changes in morphology, optical and electrical properties of these plasma treated CdS thin films were analyzed in detail. The results obtained show that plasma treatment is an effective technique in modification of the optical and electrical properties of chemical bath deposited CdS thin films.

  7. Surface structure determinations of crystalline ionic thin films grown on transition metal single crystal surfaces by low energy electron diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Roberts, Joel Glenn [Univ. of California, Berkeley, CA (United States)

    2000-05-01

    The surface structures of NaCl(100), LiF(100) and alpha-MgCl2(0001) adsorbed on various metal single crystals have been determined by low energy electron diffraction (LEED). Thin films of these salts were grown on metal substrates by exposing the heated metal surface to a molecular flux of salt emitted from a Knudsen cell. This method of investigating thin films of insulators (ionic salts) on a conducting substrate (metal) circumvents surface charging problems that plagued bulk studies, thereby allowing the use of electron-based techniques to characterize the surface.

  8. Interface morphology studies of liquid phase epitaxy grown HgCdTe films by atomic force microscopy

    Science.gov (United States)

    Azoulay, M.; George, M. A.; Burger, A.; Collins, W. E.; Silberman, E.

    1994-04-01

    In this paper we report an investigation of the morphology of the interfaces of liquid phase epitaxy (LPE) grown HgCdTe thin films on CdTe and CdZnTe substrates by atomic force microscopy (AFM) on freshly cleaved (110) crystallographic planes. An empirical observation which may be linked to lattice mismatch was indicated by an angle between the cleavage steps of the substrate to those of the film. The precipitates with size ranging from 5 nm to 20 nm were found to be most apparent near the interface.

  9. Electrical and Optical Studies of Defect Structure of HgCdTe Films Grown by Molecular Beam Epitaxy

    Science.gov (United States)

    Świątek, Z.; Ozga, P.; Izhnin, I. I.; Fitsych, E. I.; Voitsekhovskii, A. V.; Korotaev, A. G.; Mynbaev, K. D.; Varavin, V. S.; Dvoretsky, S. A.; Mikhailov, N. N.; Yakushev, M. V.; Bonchyk, A. Yu.; Savytsky, H. V.

    2016-07-01

    Electrical and optical studies of defect structure of HgCdTe films grown by molecular beam epitaxy (MBE) are performed. It is shown that the peculiarity of these films is the presence of neutral defects formed at the growth stage and inherent to the material grown by MBE. It is assumed that these neutral defects are the Te nanocomplexes. Under ion milling, they are activated by mercury interstitials and form the donor centers with the concentration of 1017 cm-3, which makes it possible to detect such defects by measurements of electrical parameters of the material. Under doping of HgCdTe with arsenic using high temperature cracking, the As2 dimers are present in the arsenic flow and block the neutral Te nanocomplexes to form donor As2Te3 complexes. The results of electrical studies are compared with the results of studies carried out by micro-Raman spectroscopy.

  10. The influence of epitaxial Ti buffer layers for fabricating as-grown MgB{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Oba, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan)]. E-mail: t3806005@iwate-u.ac.jp; Sun, P. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Harada, Y. [JST Satellite Iwate, 3-35-2 Iioka-shinden, Morioka, Iwate 020-0852 (Japan); Takahashi, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Iriuda, H. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Seki, M. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Nakanishi, Y. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Noguchi, S. [Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531 (Japan); JST-CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan); Ishida, T. [Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531 (Japan); JST-CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan); Yoshizawa, M. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); JST Satellite Iwate, 3-35-2 Iioka-shinden, Morioka, Iwate 020-0852 (Japan)

    2007-03-15

    We have measured the magnetic field dependence of the resistivity using a 35T pulsed magnet for the as-grown MgB{sub 2} films fabricated on the epitaxial Ti buffer layer grown on c-plane ZnO and Al{sub 2}O{sub 3} substrates by molecular beam epitaxy (MBE). We will report the upper critical fields (H{sub c2}) along H||c-axis and H||ab-plane. The anisotropy ratio were obtained from these H{sub c2} values. The effects of Ti buffer layer on the H{sub c2} and the anisotropy of MgB{sub 2} film were discussed.

  11. Synthesis of as-grown superconducting MgB{sub 2} thin films by molecular beam epitaxy in UHV conditions

    Energy Technology Data Exchange (ETDEWEB)

    Harada, Y.; Uduka, M.; Nakanishi, Y.; Yoshimoto, N.; Yoshizawa, M

    2004-10-01

    As-grown superconducting MgB{sub 2} thin films have been grown on SrTiO{sub 3}(0 0 1), MgO(0 0 1), and Al{sub 2}O{sub 3}(0 0 0 1) substrates by a molecular beam epitaxy (MBE) method with novel co-evaporation conditions of low deposition rate in ultra-high vacuum. The structural and physical properties of the films were studied by RHEED, XRD, electrical resistivity measurements, and SQUID magnetometer. The RHEED patterns indicate three-dimensional growth for MgB{sub 2}. The highest T{sub c} determined by resistivity measurement was about 36 K in these samples. And a clear Meissner effect below T{sub c} was observed using magnetic susceptibility measurement. We will discuss the influence of B buffer layer on the structural and physical properties.

  12. Theoretical analyses of In incorporation and compositional instability in coherently grown InGaN thin films

    Energy Technology Data Exchange (ETDEWEB)

    Yayama, Tomoe [Department of Aeronautics and Astronautics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580 (Japan); Kangawa, Yoshihiro; Kakimoto, Koichi [Department of Aeronautics and Astronautics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580 (Japan); Research Institute for Applied Mechanics, Kyushu University, 6-1 Kasuga-koen, Kasuga, Fukuoka 816-8580 (Japan); Koukitu, Akinori [Division of Applied Chemistry, Institute of Symbiotic Science and Technology, Tokyo University of Agriculture and Technology, 184-8588, Koganei (Japan)

    2010-07-15

    We performed thermodynamic analyses to calculate the relationship between the input indium molar ratio and solid composition of a coherently grown InGaN thin film that is subjected compressive or tensile stress. The theoretical approach incorporates energy loss of a thin film system due to lattice constraint from the substrate. The results show that the indium composition x of coherently grown InGaN is lower than that of stress-free InGaN. This represents the composition pulling effect. We also studied stable growth modes under various growth conditions. The results suggest the importance of control of partial pressure of NH{sub 3} to optimize growth conditions of InGaN with a unique composition. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. Enhancement of supercapacitance property of electrochemically deposited MnO2 thin films grown in acidic medium

    Science.gov (United States)

    Jana, S. K.; Rao, V. P.; Banerjee, S.

    2014-02-01

    In this communication we present supercapacitance property of MnO2 thin-films which are fabricated on stainless steel (SS) substrate by electro-deposition method carried out in different pH of the electrolyte. A significant improvement of the device performance of acid mediated grown (AMG) MnO2 over normal MnO2 (grown in neutral medium) has been achieved. We have also investigated role of interfacial structure on the internal resistance of the device material. AMG MnO2 film exhibits superior device performance with specific capacitance of 652 F/g which is 2 times better than that obtained in normal MnO2 and also energy density of 90.69 Wh/kg.

  14. Electrical characterization of annealed chemical-bath-deposited CdS films and their application in superstrate configuration CdTe/CdS solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Graf, A., E-mail: aleksandr.graf@gmail.com [Department of Physics, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Department of Materials Science, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Maticiuc, N.; Spalatu, N.; Mikli, V. [Department of Materials Science, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Mere, A. [Department of Physics, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Department of Materials Science, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Gavrilov, A. [Department of Physics, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia); Hiie, J. [Department of Materials Science, Tallinn University of Technology, 5 Ehitajate tee, 19086 Tallinn (Estonia)

    2015-05-01

    Application of chemical-bath-deposited CdS in the superstrate configuration of CdTe/CdS solar cells involving CdCl{sub 2}:O{sub 2} heat treatment of CdTe/CdS structures at about 400 °C is problematic. Namely, the vertical capillary surfaces (grain boundaries) between the columnar CdS grains perform as fast diffusion channels leading to the emergence of short circuits between the absorber and front contact. It was assumed that the grain boundaries contain residual hydroxy-oxide type compounds and form electrical barriers between columnar grains in the lateral direction of the CdS layer and that the electrical methods should be indicative of the behavior of grain boundaries in the annealing process. All samples were characterized by temperature dependence of DC conductivity in a temperature range of 50-300 K, X-ray diffraction, and scanning electron microscope. It has been found that the deeper layers of H{sub 2} and N{sub 2} annealed CdS preserve residual hydroxide, which released the gas phase in the recrystallization process of the chloride processing and created porosity on the CdTe/CdS interface. - Highlights: • We examine interface of CdS/CdTe structures after chloride heat treatment. • The mechanism of the formation of porosity in the CdS/CdTe interface is suggested. • Chloride heat treatment causes also recrystallization of CdS. • The gap between CdS and CdTe is minimal due to CdO on the grain boundaries of CdS.

  15. Dielectric and Structural Properties of SrTiO_3 Thin Films Grown by Laser Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Dielectric and Structural Properties of SrTiO_3 Thin Films Grown by Laser Molecular Beam Epitaxy[1]Hao J H,Gao J,Wang Z,et al.Interface structure and phase of epitaxial SrTi O3(110)thin fil ms grown directly on silicon[J].Appl Phys Lett,2005,87:131908. [2]Hao J H,Gao J,Wang HK.SrTi O3(110)thin fil ms grown directly on different oriented silicon substrates[J].Appl Phys A,2005,81:1233. [3]Aki mov I A,Sirenko A A,Clark A M,et al.Electric-field-induced soft-mode hardening in SrTi O3fil ms[J].Phys Rev Lett...

  16. Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

    Science.gov (United States)

    Kukli, Kaupo; Aarik, Jaan; Aidla, Aleks; Uustare, Teet; Jõgi, Indrek; Lu, Jun; Tallarida, Massimo; Kemell, Marianna; Kiisler, Alma-Asta; Ritala, Mikko; Leskelä, Markku

    2010-06-01

    Ru thin films were grown on TiO 2, Al 2O 3, HfO 2, and ZrO 2 films as well as on HF-etched silicon and SiO 2-covered silicon by atomic layer deposition from 1-ethyl-1'-methyl-ruthenocene, (CH 3C 5H 4)(C 2H 5C 5H 4)Ru, and oxygen. The growth of Ru was obtained and characterized at temperatures ranging from 250 to 325 °C. On epitaxial rutile, highly oriented growth of Ru with hexagonal structure was achieved, while on other substrates the films possessed nonoriented hexagonal structure. Ruthenium oxide was not detected in the films. The lowest resistivity value obtained for 5.0-6.6 nm thick films was 26 μΩ cm. The conductivity of the films depended somewhat on the deposition cycle time parameters and, expectedly, more strongly on the amount of deposition cycles. Increase in the deposition temperature of underlying metal oxide films increased the conductivity of Ru layers.

  17. Characteristics of atomic layer deposition grown HfO{sub 2} films after exposure to plasma treatments

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Y.W. [Kookje Electric Korea Co. LTD, 4-2 Chaam-Dong, Chonan-Si, Chungcheongnam-Do (Korea, Republic of)]. E-mail: ywkim@kekorea.co.kr; Roh, Y. [School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Yoo, Ji-Beom [School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)]. E-mail: jibyoo@skku.ac.kr; Kim, Hyoungsub [School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2007-01-22

    Ultra thin HfO{sub 2} films were grown by the atomic layer deposition (ALD) technique using tetrakismethylethylaminohafnium (Hf[N(CH){sub 3}(C{sub 2}H{sub 5})]{sub 4}) and ozone (O{sub 3}) as the precursors and subsequently exposed to various plasma conditions, i.e., CCP (capacitively coupled plasma) and MMT (modified magnetron typed plasma) in N{sub 2} or N{sub 2}/O{sub 2} ambient. The conventional CCP treatment was not effective in removing the carbon impurities, which were incorporated during the ALD process, from the HfO{sub 2} films. However, according to the X-ray photoelectron spectroscopy measurements, the MMT treated films exhibited a significant reduction in their carbon contents and the efficient incorporation of nitrogen atoms. Although the incorporated nitrogen was easily released during the post-thermal annealing of the MMT treated samples, it was more effective than the CCP treatment in removing the film impurities. Consequently, the MMT treated samples exhibited excellent electrical properties as compared to the as-deposited HfO{sub 2} films, including negligible hysteresis (flatband voltage shift), a low leakage current, and the reduced equivalent oxide thickness of the gate stack. In conclusion, MMT post treatment is more effective than conventional CCP treatment in improving the electrical properties of high-k films by reducing the carbon contamination and densifying the as-deposited defective films.

  18. Substrate dependent structural, optical and electrical properties of ZnS thin films grown by RF sputtering

    Science.gov (United States)

    Pathak, Trilok K.; Kumar, Vinod; Purohit, L. P.; Swart, H. C.; Kroon, R. E.

    2016-10-01

    Zinc sulphide (ZnS) films are of great importance for applications in various optoelectronic devices. ZnS thin films were grown on glass, indium tin oxide (ITO) and Corning glass substrates by radio-frequency magnetron sputtering at a temperature of 373 K and a comparative study of the structural, optical and electrical properties was performed using X-ray diffraction (XRD), scanning electron microscopy, optical and current-voltage (I-V) measurements. The XRD patterns showed that the sputtered thin films exhibited good crystallinity with the (111) peak around 2θ=28.3° indicating preferential orientation of the cubic structure. The maximum strain and most densely packed grains were obtained for the Corning glass substrate. The transmittance spectra of the films were measured in the wavelength range from 200 to 800 nm, showing that the films are about 77% transparent in the visible region. A slight change of 3.50 eV to 3.54 eV was found for the bandgap of the films deposited on different substrates. The ZnS thin films deposited on Corning glass show better crystallinity, morphology and I-V characteristics than that deposited on ordinary glass and ITO substrates.

  19. Effect of substrate temperature on the structure of amorphous oxygenated hydrocarbon films grown with a pulsed supersonic methane plasma flow

    Science.gov (United States)

    Fedoseeva, Yu. V.; Pozdnyakov, G. A.; Okotrub, A. V.; Kanygin, M. A.; Nastaushev, Yu. V.; Vilkov, O. Y.; Bulusheva, L. G.

    2016-11-01

    Since amorphous oxygenated hydrocarbon (COxHy) films are promising engineering materials a study of the structure and composition of the films depending on the conditions of synthesis is important for controlling of their physicochemical properties. Here, we used the methods of scanning and transmission electron microscopy, X-ray photoelectron, near-edge X-ray absorption fine structure, Fourier transform infrared and Raman spectroscopy to reveal changes in the chemical connectivity of COxHy films grown on silicon substrates heated to 300, 500, and 700 °C using a supersonic flow of methane plasma. It was found that the COxHy films, deposited at 300 and 500 °C, were mainly composed of the sp2-hybridized carbon areas with various oxygen species. A rise of the substrate temperature caused an increase of the portion of tetrahedral carbon atoms as well as carboxyl and hydroxyl groups. With growth of the substrate temperature, the film thickness reduced monotonically from 400 to 180 nm, while the film adhesion improved substantially. The films, deposited at lower temperatures, showed high hydrophilicity due to porosity and presence of oxygenated groups both at the surface and in the bulk.

  20. Titanium nitride: A new Ohmic contact material for n-type CdS

    NARCIS (Netherlands)

    Didden, A.; Battjes, H.; Machunze, R.; Dam, B.; Van de Krol, R.

    2011-01-01

    In devices based on CdS, indium is often used to make Ohmic contacts. Since indium is scarce and expensive, suitable replacement materials need to be found. In this work, we show that sputtered titanium nitride forms an Ohmic contact with n-type CdS. The CdS films, deposited with chemical bath depos

  1. First principles calculations of point defect diffusion in CdS buffer layers: Implications for Cu(In,Ga)(Se,S)2 and Cu2ZnSn(Se,S)4-based thin-film photovoltaics

    Science.gov (United States)

    Varley, J. B.; Lordi, V.; He, X.; Rockett, A.

    2016-01-01

    We investigate point defects in CdS buffer layers that may arise from intermixing with Cu(In,Ga)Se2 (CIGSe) or Cu2ZnSn(S,Se)4 (CZTSSe) absorber layers in thin-film photovoltaics (PV). Using hybrid functional calculations, we characterize the migration barriers of Cu, In, Ga, Se, Sn, Zn, Na, and K impurities and assess the activation energies necessary for their diffusion into the bulk of the buffer. We find that Cu, In, and Ga are the most mobile defects in CIGS-derived impurities, with diffusion expected to proceed into the buffer via interstitial-hopping and cadmium vacancy-assisted mechanisms at temperatures ˜400 °C. Cu is predicted to strongly favor migration paths within the basal plane of the wurtzite CdS lattice, which may facilitate defect clustering and ultimately the formation of Cu-rich interfacial phases as observed by energy dispersive x-ray spectroscopic elemental maps in real PV devices. Se, Zn, and Sn defects are found to exhibit much larger activation energies and are not expected to diffuse within the CdS bulk at temperatures compatible with typical PV processing temperatures. Lastly, we find that Na interstitials are expected to exhibit slightly lower activation energies than K interstitials despite having a larger migration barrier. Still, we find both alkali species are expected to diffuse via an interstitially mediated mechanism at slightly higher temperatures than enable In, Ga, and Cu diffusion in the bulk. Our results indicate that processing temperatures in excess of ˜400 °C will lead to more interfacial intermixing with CdS buffer layers in CIGSe devices, and less so for CZTSSe absorbers where only Cu is expected to significantly diffuse into the buffer.

  2. First principles calculations of point defect diffusion in CdS buffer layers: Implications for Cu(In,Ga)(Se,S){sub 2} and Cu{sub 2}ZnSn(Se,S){sub 4}-based thin-film photovoltaics

    Energy Technology Data Exchange (ETDEWEB)

    Varley, J. B.; Lordi, V. [Lawrence Livermore National Laboratory, Livermore, California 94550 (United States); He, X.; Rockett, A. [Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)

    2016-01-14

    We investigate point defects in CdS buffer layers that may arise from intermixing with Cu(In,Ga)Se{sub 2} (CIGSe) or Cu{sub 2}ZnSn(S,Se){sub 4} (CZTSSe) absorber layers in thin-film photovoltaics (PV). Using hybrid functional calculations, we characterize the migration barriers of Cu, In, Ga, Se, Sn, Zn, Na, and K impurities and assess the activation energies necessary for their diffusion into the bulk of the buffer. We find that Cu, In, and Ga are the most mobile defects in CIGS-derived impurities, with diffusion expected to proceed into the buffer via interstitial-hopping and cadmium vacancy-assisted mechanisms at temperatures ∼400 °C. Cu is predicted to strongly favor migration paths within the basal plane of the wurtzite CdS lattice, which may facilitate defect clustering and ultimately the formation of Cu-rich interfacial phases as observed by energy dispersive x-ray spectroscopic elemental maps in real PV devices. Se, Zn, and Sn defects are found to exhibit much larger activation energies and are not expected to diffuse within the CdS bulk at temperatures compatible with typical PV processing temperatures. Lastly, we find that Na interstitials are expected to exhibit slightly lower activation energies than K interstitials despite having a larger migration barrier. Still, we find both alkali species are expected to diffuse via an interstitially mediated mechanism at slightly higher temperatures than enable In, Ga, and Cu diffusion in the bulk. Our results indicate that processing temperatures in excess of ∼400 °C will lead to more interfacial intermixing with CdS buffer layers in CIGSe devices, and less so for CZTSSe absorbers where only Cu is expected to significantly diffuse into the buffer.

  3. 13.4% efficient thin-film CdS/CdTe solar cells

    Science.gov (United States)

    Chu, T. L.; Chu, S. S.; Ferekides, C.; Wu, C. Q.; Britt, J.; Wang, C.

    1991-12-01

    Cadmium telluride is a promising thin-film photovoltaic material as shown by the more than 10% efficient CdS/CdTe heterojunction solar cells. In this work, thin-film CdS/CdTe solar cells have been prepared using CdS films grown from an aqueous solution and p-CdTe films deposited by close-spaced sublimation (CSS). The properties of CdS films deposited from an ammonical solution of a Cd-salt, an ammonium salt, and thiourea have been controlled by optimizing the temperature and composition of the solution. The solution-grown CdS films have a high photoconductivity ratio, and its optical transmission is superior to that of vacuum evaporated CdS films. The properties of p-CdTe films deposited by CSS have been optimized by controlling the temperature and composition of the source material, and the substrate temperature. The properties of CdS/CdTe heterojunctions have been studied; junction photovoltage spectroscopy is used for the qualitative comparison of junction characteristics. Solar cells of 1-cm2 area with an AM 1.5 efficiency of 13.4% are reported.

  4. The Luminescent Properties and Atomic Structures of As-Grown and Annealed Nanostructured Silicon Rich Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    N. D. Espinosa-Torres

    2016-01-01

    Full Text Available Not long ago, we developed a theoretical model to describe a set of chemical reactions that can potentially occur during the process of obtaining Silicon Rich Oxide (SRO films, an off stoichiometry material, notwithstanding the technique used to grow such films. In order to elucidate the physical chemistry properties of such material, we suggested the chemical reactions that occur during the process of growing of SRO films in particular for the case of the Low Pressure Chemical Vapor Deposition (LPCVD technique in the aforementioned model. The present paper represents a step further with respect to the previous (published work, since it is dedicated to the calculation by Density Functional Theory (DFT of the optical and electronic properties of the as-grown and annealed SRO structures theoretically predicted on the basis of the previous work. In this work, we suggest and evaluate either some types of molecules or resulting nanostructures and we predict theoretically, by applying the DFT, the contribution that they may have to the phenomenon of luminescence (PL, which is experimentally measured in SRO films. We evaluated the optical and electronic properties of both the as-grown and the annealed structures.

  5. Room temperature ferromagnetism in epitaxial Cr{sub 2}O{sub 3} thin films grown on r-sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Punugupati, Sandhyarani, E-mail: spunugu@ncsu.edu; Narayan, Jagdish; Hunte, Frank [Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)

    2015-05-21

    We report on the epitaxial growth and magnetic properties of Cr{sub 2}O{sub 3} thin films grown on r-sapphire substrate using pulsed laser deposition. The X-ray diffraction (XRD) (2θ and Φ) and TEM characterization confirm that the films are grown epitaxially. The r-plane (011{sup ¯}2) of Cr{sub 2}O{sub 3} grows on r-plane of sapphire. The epitaxial relations can be written as [011{sup ¯}2] Cr{sub 2}O{sub 3} ‖ [011{sup ¯}2] Al{sub 2}O{sub 3} (out-of-plane) and [1{sup ¯}1{sup ¯}20] Cr{sub 2}O{sub 3} ‖ [1{sup ¯}1{sup ¯}20] Al{sub 2}O{sub 3} (in-plane). The as-deposited films showed ferromagnetic behavior up to 400 K but ferromagnetism almost vanishes with oxygen annealing. The Raman spectroscopy data together with strain measurements using high resolution XRD indicate that ferromagnetism in r-Cr{sub 2}O{sub 3} thin films is due to the strain caused by defects, such as oxygen vacancies.

  6. Investigation of the optimal annealing temperature for the enhanced thermoelectric properties of MOCVD-grown ZnO films

    Science.gov (United States)

    Mahmood, K.; Ali, A.; Arshad, M. I.; Ajaz un Nabi, M.; Amin, N.; Faraz Murtaza, S.; Rabia, S.; Azhar Khan, M.

    2017-04-01

    In this study, we demonstrate the optimization of the annealing temperature for enhanced thermoelectric properties of ZnO. Thin films of ZnO are grown on a sapphire substrate using the metal organic chemical Vapor Deposition (MOCVD) technique. The grown films are annealed in an oxygen environment at 600-1000°C, with a step of 100°C for one hour. Seebeck measurements at room temperature revealed that the Seebeck coefficient of the sample that was not annealed was 152 μV/K, having a carrier concentration of N D 1.46 × 1018 cm-3. The Seebeck coefficient of the annealed films increased from 212 to 415 μV/K up to 900°C and then decreased at 1000°C. The power factor is calculated and found to have an increasing trend with the annealing temperature. This observation is explained by the theory of Johnson and Lark-Horovitz that thermoelectric properties are enhanced by improving the structure of ZnO thin films. The Hall measurements and PL data strongly justify the proposed argument.

  7. Properties of boron and phosphorous incorporated tetrahedral amorphous carbon films grown using filtered cathodic vacuum arc process

    Energy Technology Data Exchange (ETDEWEB)

    Panwar, O.S., E-mail: ospanwar@mail.nplindia.ernet.in [Plasma Processed Materials Group, National Physical Laboratory (CSIR), Dr. K.S. Krishnan Road, New Delhi 110012 (India); Khan, Mohd Alim [Plasma Processed Materials Group, National Physical Laboratory (CSIR), Dr. K.S. Krishnan Road, New Delhi 110012 (India); Satyanarayana, B.S. [40, Sreeniketan, NDSE 24, New Delhi 110096 (India); Kumar, Sushil; Ishpal [Plasma Processed Materials Group, National Physical Laboratory (CSIR), Dr. K.S. Krishnan Road, New Delhi 110012 (India)

    2010-04-15

    This paper reports the electrical, mechanical, structural and field emission properties of as grown and also boron and phosphorous incorporated tetrahedral amorphous carbon (ta-C) films, deposited using a filtered cathodic vacuum arc process. The effect of varying boron and phosphorous content (up to 2.0 at.% in to ta-C) on the conductivity ({sigma}{sub D}), activation energy ({Delta}E{sub 1}), hardness, microstructure, emission threshold (E{sub turn-ON}) and emission current density (J) at 12.5 V/{mu}m of ta-C: B and ta-C: P films deposited at a high negative substrate bias of -300 V are reported. It is observed that both boron and phosphorous incorporation leads to a nearly an order increase in {sigma}{sub D} and corresponding decrease in {Delta}E{sub 1} and a slight increase in hardness as compared to as grown ta-C films. In the case of field assisted electron emission, it is observed that E{sub turn-ON} increases and J decreases. The changes are attributed to the changes in the sp{sup 3}/sp{sup 2} ratio of the films due to boron and phosphorous incorporation. The effect of boron on ta-C is to give a p-type effect whereas the effect of phosphorous gives n-type doping effect.

  8. Surface morphologies of MOCVD-grown GaN films on sapphire studied by scanning tunneling microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, J.; Reddic, J.E.; Sinha, M.; Ricker, W.S.; Karlinsey, J.; Yang, J.-W.; Khan, M.A.; Chen, D.A

    2002-12-30

    The surface morphologies of MOCVD GaN films grown on sapphire substrates have been investigated by scanning tunneling microscopy (STM). High quality STM images could not be obtained prior to cleaning the les in HF, hot HCl or 2 M NaOH. STM images of the GaN films showed that the surfaces consisted of curved step edges and interlocking terraces, which were roughly 224 nm wide. Surface pits approximately 2-5 nm deep and 50-80 nm wide were observed on the GaN films, and these pits were preferentially located at a juncture between two step edges. Previous studies in the literature involving MOCVD-grown GaN on sapphire have demonstrated that the surface pits are associated with screw-component threading dislocations. Therefore, the number of screw-component threading dislocations in these GaN films is estimated as 6.3x10{sup 8} cm{sup -2} from the number surface pits observed in the STM images. X-ray photoelectron studies indicated that the major surface contaminants before cleaning were carbon and oxygen. Treatment in HF or HCl removed oxygen from the surface while treatment in NaOH was more effective at removing surface carbon.

  9. Unpredicted surface termination of α-Fe2O3(0001) film grown by mist chemical vapor deposition

    Science.gov (United States)

    Osaka, Shun; Kubo, Osamu; Takahashi, Kazuki; Oda, Masaya; Kaneko, Kentaro; Tabata, Hiroshi; Fujita, Shizuo; Katayama, Mitsuhiro

    2017-06-01

    We analyze the surface structure of an α-Fe2O3(0001) film grown on a c-plane sapphire substrate by mist chemical vapor deposition (CVD), which has been recently developed as a simple, safe, and cost-effective film growth method. Using coaxial impact-collision ion scattering spectroscopy, we found that the atomic-layer sequence of the surface termination of an α-Fe2O3(0001) film grown by mist CVD was Fe-O3-Fe- from the top layer. This surface termination is predicted to form in an oxygen-poor environment by density functional theory combined with a thermodynamical approach despite that the mist CVD process is performed with atmospheric-pressure air. The surface structure markedly changes after annealing above 600 °C in ultrahigh vacuum. We found that only a couple of layers from the top layer transform into Fe3O4(111) after 650 °C annealing, which would be so-called biphase reconstruction. Complete transformation into a Fe3O4(111) film occurs at 700 °C, whose atomic-layer sequence is determined to be Fe-O4-Fe3- from the top layer.

  10. Embedded polytypes in Bi2Sr2-xLaxCuO6 thin films grown by laser ablation

    Science.gov (United States)

    Cancellieri, C.; Lin, P. H.; Ariosa, D.; Pavuna, D.

    2007-11-01

    We investigate the presence of secondary phases in La-doped Bi-2201 thin films grown by laser ablation. The cation ratios in the target material, the oxygen pressure, and the substrate temperature during the deposition are the main parameters determining the presence of diluted intergrowth and/or polytype aggregates. A statistical model of random intergrowth is used to analyze the x-ray diffraction (XRD) anomalies caused by hidden defects and to characterize the latter. A detailed structural XRD refinement on oriented aggregates allows us to identify the guest phase as a Bi deficient phase, Bi-1201. The occurrence of this particular embedded polytype is accompanied by a global Bi deficiency introduced in the films by the growing process and/or by the annealing treatment. The presence of La favors the Bi-1201 formation mostly as La-rich c -axis oriented aggregates. Bi excess in the target material improves considerably the crystallographic structure of Bi-2201, avoids intergrowth formation, but does not prevent the phase separation of Bi-1201 in La-doped thin films. We also investigate the influence of the deposition parameters on the type of intergrowth as well as their variation with La doping. This work introduces a specific methodology for optimizing the growth of thin films grown by laser ablation, which applies to layered oxides that admit polytypes with close formation enthalpies in their phase diagram.

  11. Formation of the physical vapor deposited CdS /Cu(In,Ga)Se2 interface in highly efficient thin film solar cells

    Science.gov (United States)

    Rusu, M.; Glatzel, Th.; Neisser, A.; Kaufmann, C. A.; Sadewasser, S.; Lux-Steiner, M. Ch.

    2006-04-01

    We report on the buffer/absorber interface formation in highly efficient (14.5%, air mass 1.5) ZnO /CdS/Cu(In,Ga)Se2 solar cells with a physical vapor deposited CdS buffer. For Se-decapped Cu (In,Ga)Se2 (CIGSe) absorbers we observe sulfur passivation of the CIGSe grain boundaries during CdS growth and at the interface a thermally stimulated formation of a region with a higher band gap than that of the absorber bulk, determining the height of the potential barrier at the CdS /CIGSe interface. For air-exposed CIGSe samples the grain boundary passivation is impeded by a native oxide/adsorbate layer at the CIGSe surface determining the thermal stability of the potential barrier height.

  12. Effect of substrate temperature on the structure of amorphous oxygenated hydrocarbon films grown with a pulsed supersonic methane plasma flow

    Energy Technology Data Exchange (ETDEWEB)

    Fedoseeva, Yu. V., E-mail: fedoseeva@niic.nsc.ru [Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Novosibirsk State University, Novosibirsk 630090 (Russian Federation); Pozdnyakov, G.A. [Khristianovich Institute of Theoretical and Applied Mechanics, SB RAS, Novosibirsk 630090 (Russian Federation); Okotrub, A.V.; Kanygin, M.A. [Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Novosibirsk State University, Novosibirsk 630090 (Russian Federation); Nastaushev, Yu. V. [Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk 630090 (Russian Federation); Vilkov, O.Y. [St. Petersburg State University, St. Petersburg 198504 (Russian Federation); Bulusheva, L.G. [Nikolaev Institute of Inorganic Chemistry SB RAS, Novosibirsk 630090 (Russian Federation); Novosibirsk State University, Novosibirsk 630090 (Russian Federation)

    2016-11-01

    Highlights: • A deposition of supersonic methane plasma flow on silicon substrate produces amorphous oxygenated hydrocarbon (CO{sub x}H{sub y}) film. • The thickness, composition, and wettability of the film depend on the substrate temperature. • A rise of the substrate temperature from 500 to 700 °C promotes the sp{sup 3}-hybridization carbon formation. - Abstract: Since amorphous oxygenated hydrocarbon (CO{sub x}H{sub y}) films are promising engineering materials a study of the structure and composition of the films depending on the conditions of synthesis is important for controlling of their physicochemical properties. Here, we used the methods of scanning and transmission electron microscopy, X-ray photoelectron, near-edge X-ray absorption fine structure, Fourier transform infrared and Raman spectroscopy to reveal changes in the chemical connectivity of CO{sub x}H{sub y} films grown on silicon substrates heated to 300, 500, and 700 °C using a supersonic flow of methane plasma. It was found that the CO{sub x}H{sub y} films, deposited at 300 and 500 °C, were mainly composed of the sp{sup 2}-hybridized carbon areas with various oxygen species. A rise of the substrate temperature caused an increase of the portion of tetrahedral carbon atoms as well as carboxyl and hydroxyl groups. With growth of the substrate temperature, the film thickness reduced monotonically from 400 to 180 nm, while the film adhesion improved substantially. The films, deposited at lower temperatures, showed high hydrophilicity due to porosity and presence of oxygenated groups both at the surface and in the bulk.

  13. Positive magnetoresistance in ferromagnetic Nd-doped In2O3 thin films grown by pulse laser deposition

    KAUST Repository

    Xing, G. Z.

    2014-05-23

    We report the magnetic and magnetotransport properties of (In 0.985Nd0.015)2O2.89 thin films grown by pulse laser deposition. The clear magnetization hysteresis loops with the complementary magnetic domain structure reveal the intrinsic room temperature ferromagnetism in the as-prepared films. The strong sp-f exchange interaction as a result of the rare earth doping is discussed as the origin of the magnetotransport behaviours. A positive magnetoresistance (∼29.2%) was observed at 5 K and ascribed to the strong ferromagnetic sp-f exchange interaction in (In0.985Nd0.015)2O 2.89 thin films due to a large Zeeman splitting in an external magnetic field of 50 KOe. © 2014 AIP Publishing LLC.

  14. Novel stage in fabrication of as-grown MgB{sub 2} films by adopting Ti seed layer

    Energy Technology Data Exchange (ETDEWEB)

    Harada, Y. [JST Satellite Iwate, Japan Science and Technology Agency, 3-35-2 Iiokashinden, Morioka, Iwate 020-0852 (Japan)], E-mail: yharada@iwate-jst-satellite.jp; Yamaguchi, H. [National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba 305-8568 (Japan); Oba, T. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Fujine, Y. [JST Satellite Iwate, Japan Science and Technology Agency, 3-35-2 Iiokashinden, Morioka, Iwate 020-0852 (Japan); Goto, S. [Lightom, Sugo 95-2, Takizawa 020-0173 (Japan); Iriuda, H. [Graduate School of Engineering, Iwate University, 4-3-5 Ueda, Morioka, Iwate 020-8551 (Japan); Yoshizawa, M. [National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba 305-8568 (Japan)

    2007-10-01

    We report that Ti buffer layer improves the structural quality and superconducting properties of MgB{sub 2} film deposited on ZnO (0 0 0 1) and Al{sub 2}O{sub 3} (0 0 0 1) substrates using molecular beam epitaxy. It was found that Ti layers were grown epitaxially on the substrates and the MgB{sub 2} films were c-axis oriented with two types of in-plane orientations. The crystal quality measured by the rocking curve width of X-ray diffraction peak was improved and superconducting transition temperature increased as the buffer layer thickness increased on both substrates. The highest T{sub c} observed in this study was 37 K and 35 K in the film deposited on the Ti buffer layer 50 nm thick with the ZnO and Al{sub 2}O{sub 3} substrates, respectively.

  15. Dislocation densities reduction in MBE-grown AlN thin films by high-temperature annealing

    Science.gov (United States)

    Nemoz, Maud; Dagher, Roy; Matta, Samuel; Michon, Adrien; Vennéguès, Philippe; Brault, Julien

    2017-03-01

    AlN thin films, grown on (0001) sapphire substrates by molecular beam epitaxy (MBE), were annealed at high temperature (up to 1650 °C) in flowing N2. X-ray diffraction (XRD) studies, combined with Williamson-Hall and Srikant plots, have shown that annealing leads to a strong reduction of both edge and mixed threading dislocation densities, as confirmed by transmission electron microscopy (TEM) images, up to 75%. Moreover, it is found that annealing at high temperatures allows the relaxation of the tensile strain in the AlN film due to the growth process. In addition, the morphological properties of the films were determined by atomic force microscopy (AFM) and show that the annealing conditions have a strong impact on the surface morphology and roughness. Finally, an annealing at 1550 °C for 20 min appears as an ideal tradeoff to enhance the structural properties while preserving the initial AlN surface morphology.

  16. Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Berdova, Maria; Liu, Xuwen; Franssila, Sami, E-mail: sami.franssila@aalto.fi [Department of Materials Science and Engineering, Aalto University, 02150 Espoo (Finland); Wiemer, Claudia; Lamperti, Alessio; Tallarida, Grazia; Cianci, Elena [Laboratorio MDM, IMM CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB) (Italy); Fanciulli, Marco [Laboratorio MDM, IMM CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy and Dipartimento di Scienza dei Materiali, Università degli studi di Milano Bicocca, 20126 Milano (Italy)

    2016-09-15

    The investigation of mechanical properties of atomic layer deposition HfO{sub 2} films is important for implementing these layers in microdevices. The mechanical properties of films change as a function of composition and structure, which accordingly vary with deposition temperature and post-annealing. This work describes elastic modulus, hardness, and wear resistance of as-grown and annealed HfO{sub 2}. From nanoindentation measurements, the elastic modulus and hardness remained relatively stable in the range of 163–165 GPa and 8.3–9.7 GPa as a function of deposition temperature. The annealing of HfO{sub 2} caused significant increase in hardness up to 14.4 GPa due to film crystallization and densification. The structural change also caused increase in the elastic modulus up to 197 GPa. Wear resistance did not change as a function of deposition temperature, but improved upon annealing.

  17. Unconventional magnetization of Fe3O4 thin film grown on amorphous SiO2 substrate

    Directory of Open Access Journals (Sweden)

    Jia-Xin Yin

    2016-06-01

    Full Text Available High quality single crystal Fe3O4 thin films with (111 orientation had been prepared on amorphous SiO2 substrate by pulsed laser deposition. The magnetization properties of the films are found to be unconventional. The Verwey transition temperature derived from the magnetization jump is around 140K, which is higher than the bulk value and it can be slightly suppressed by out-plane magnetic field; the out-of-plane magnetization, which is unexpectedly higher than the in-plane value, is also significantly increased as compared with the bulk value. Our findings highlight the unusual magnetization of Fe3O4 thin film grown on the amorphous SiO2 substrate.

  18. Effects of nitrogen on the growth and optical properties of ZnO thin films grown by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cui, J B; Thomas, M A; Soo, Y C; Kandel, H; Chen, T P [Department of Physics and Astronomy, University of Arkansas at Little Rock, Little Rock, AR 72204 (United States)

    2009-08-07

    ZnO thin films were grown using pulsed laser deposition by ablating a Zn target in various mixtures of O{sub 2} and N{sub 2}. The presence of N{sub 2} during deposition was found to affect the growth of the ZnO thin films and their optical properties. Small N{sub 2} concentrations during growth led to strong acceptor-related photoluminescence (PL), while larger concentrations affected both the intensity and temperature dependence of the emission peaks. In addition, the PL properties of the annealed ZnO thin films are associated with the N{sub 2} concentration during their growth. The possible role of nitrogen in ZnO growth and annealing is discussed.

  19. Correlation of nanochemistry and electrical properties in HfO2 films grown by metalorganic molecular-beam epitaxy

    Science.gov (United States)

    Moon, Tae-Hyoung; Ham, Moon-Ho; Myoung, Jae-Min

    2005-03-01

    We present the annealing effects on nanochemistry and electrical properties in HfO2 dielectrics grown by metalorganic molecular-beam epitaxy. After the postannealing treatment of HfO2 films in the temperature range of 600-800°C, the thicknesses and chemical states of the films were examined by high-resolution transmission electron microscopy and angle-resolved x-ray photoelectron spectroscopy. By comparing the line shapes of core-level spectra for the samples with different annealing temperatures, the concentrations of SiO and Hf-silicate with high dielectric constant are found to be highest for HfO2 film annealed at 700°C. This result supports that the accumulation capacitance of the sample annealed at 700°C is not deteriorated in spite of a steep increase in interfacial layer thickness compared with that of the sample annealed at 600°C.

  20. Magnetic properties of Sm-Co thin films grown on MgO(100) deposited from a single alloy target

    Energy Technology Data Exchange (ETDEWEB)

    Verhagen, T. G. A.; Boltje, D. B.; Ruitenbeek, J. M. van; Aarts, J., E-mail: aarts@physics.leidenuniv.nl [Huygens-Kamerlingh Onnes Laboratorium, Universiteit Leiden, P.O. Box 9504, 2300 RA Leiden (Netherlands)

    2014-08-07

    We have grown epitaxial Sm-Co thin films by sputter deposition from a single alloy target with a nominal SmCo{sub 5} composition on Cr(100)-buffered MgO(100) single-crystal substrates. By varying the Ar gas pressure, we can change the composition of the film from a SmCo{sub 5}-like to a Sm{sub 2}Co{sub 7}-like phase. The composition, crystal structure, morphology, and magnetic properties of these films have been determined using Rutherford Backscattering, X-ray diffraction, and magnetization measurements. We find that we can grow films with, at room temperature, coercive fields as high as 3.3 T, but with a remanent magnetization which is lower than can be expected from the texturing. This appears to be due to the Sm content of the films, which is higher than expected from the content of the target, even at the lowest possible sputtering pressures. Moreover, we find relatively large variations of film properties using targets of nominally the same composition. At low temperatures, the coercive fields increase, as expected for these hard magnets, but in the magnetization, we observe a strong background signal from the paramagnetic impurities in the MgO substrates.

  1. Magnetic properties of Sm-Co thin films grown on MgO(100) deposited from a single alloy target

    Science.gov (United States)

    Verhagen, T. G. A.; Boltje, D. B.; van Ruitenbeek, J. M.; Aarts, J.

    2014-08-01

    We have grown epitaxial Sm-Co thin films by sputter deposition from a single alloy target with a nominal SmCo5 composition on Cr(100)-buffered MgO(100) single-crystal substrates. By varying the Ar gas pressure, we can change the composition of the film from a SmCo5-like to a Sm2Co7-like phase. The composition, crystal structure, morphology, and magnetic properties of these films have been determined using Rutherford Backscattering, X-ray diffraction, and magnetization measurements. We find that we can grow films with, at room temperature, coercive fields as high as 3.3 T, but with a remanent magnetization which is lower than can be expected from the texturing. This appears to be due to the Sm content of the films, which is higher than expected from the content of the target, even at the lowest possible sputtering pressures. Moreover, we find relatively large variations of film properties using targets of nominally the same composition. At low temperatures, the coercive fields increase, as expected for these hard magnets, but in the magnetization, we observe a strong background signal from the paramagnetic impurities in the MgO substrates.

  2. Photo- and Electrochromic Properties of Activated Reactive Evaporated MoO3 Thin Films Grown on Flexible Substrates

    Directory of Open Access Journals (Sweden)

    K. Hari Krishna

    2008-01-01

    Full Text Available The molybdenum trioxide (MoO3 thin films were grown onto ITO-coated flexible Kapton substrates using plasma assisted activated reactive evaporation technique. The film depositions were carried out at constant glow power and oxygen partial pressures of 8 W and 1×10−3 Torr, respectively. The influence of substrate temperature on the microstructural and optical properties was investigated. The MoO3 thin films prepared at a substrate temperature of 523 K were found to be composed of uniformly distributed nanosized grains with an orthorhombic structure of α-MoO3. These nanocrystalline MoO3 thin films exhibited higher optical transmittance of about 80% in the visible region with an evaluated optical band gap of 3.29 eV. With the insertion of 12.5 mC/cm2, the films exhibited an optical modulation of 40% in the visible region with coloration efficiency of 22 cm2/C at the wavelength of 550 nm. The MoO3 films deposited at 523 K demonstrated better photochromic properties and showed highest color center concentration for the irradiation time of 30 minutes at 100 mW/cm2.

  3. Raman analyses of residual stress in diamond thin films grown on Ti6Al4V alloy

    Directory of Open Access Journals (Sweden)

    Azevedo Adriana F.

    2003-01-01

    Full Text Available The stress evolution in diamond films grown on Ti6Al4V was investigated in order to develop a comprehensive view of the residual stress formation. Residual stress is composed of intrinsic stress induced during diamond film growth and extrinsic stress caused by the different thermal expansion coefficients between the film and substrate. In the coalescence stage it has been observed that the residual stress is dominated by the microstructure, whereas on continuous films, the thermal stress is more important. In this work diamond thin films with small grain size and good size and good quality were obtained in a surface wave-guide microwave discharge, the Surfatron system, with a negative bias voltage applied between the plasma shell and substrate. For above of -100V applied bias, the ratio of carbon sp³/sp² bond may increase and the nucleation rate increase arising the high value at the -250V applied bias. Stress measurements and sp³ content in the film were studied by Raman scattering spectroscopy. The total residual stress is compressive and varied from -1.52 to -1.48 GPa between 0 and -200 V applied bias, respectively, and above the -200 V, the compressive residual stress increased drastically to -1.80 GPa. The diamond nucleation density was evaluated by top view SEM images.

  4. Anomalous thickness-dependent optical energy gap of ALD-grown ultra-thin CuO films

    Science.gov (United States)

    Tripathi, T. S.; Terasaki, I.; Karppinen, M.

    2016-11-01

    Usually an inverse square relation between the optical energy gap and the size of crystallites is observed for semiconducting materials due to the strong quantum localization effect. Coulomb attraction that may lead to a proportional dependence is often ignored or considered less important to the optical energy gap when the crystallite size or the thickness of a thin film changes. Here we report a proportional dependence between the optical energy gap and the thickness of ALD-grown CuO thin films due to a strong Coulomb attraction. The ultrathin films deposited in the thickness range of 9-81 nm show a p-type semiconducting behavior when analyzed by Seebeck coefficient and electrical resistivity measurements. The indirect optical energy gap nature of the films is verified from UV-vis spectrophotometric measurements. A progressive increase in the indirect optical energy gap from 1.06 to 1.24 eV is observed with the increase in the thickness of the films. The data are analyzed in the presence of Coulomb attractions using the Brus model. The optical energy gap when plotted against the cubic root of the thickness of the films shows a linear dependence.

  5. Thin yttrium iron garnet films grown by pulsed laser deposition: Crystal structure, static, and dynamic magnetic properties

    Energy Technology Data Exchange (ETDEWEB)

    Sokolov, N. S., E-mail: nsokolov@fl.ioffe.ru; Fedorov, V. V.; Korovin, A. M.; Suturin, S. M.; Baranov, D. A.; Gastev, S. V.; Krichevtsov, B. B.; Bursian, V. E.; Lutsev, L. V. [Ioffe Physical-Technical Institute of Russian Academy of Sciences, St. Petersburg 194021 (Russian Federation); Maksimova, K. Yu.; Grunin, A. I. [Immanuel Kant Baltic Federal University, Kaliningrad 236041 (Russian Federation); Tabuchi, M. [Synchrotron Radiation Research Center, Nagoya University, Nagoya 464-8603 (Japan)

    2016-01-14

    Pulsed laser deposition has been used to grow thin (10–84 nm) epitaxial layers of Yttrium Iron Garnet Y{sub 3}Fe{sub 5}O{sub 12} (YIG) on (111)–oriented Gadolinium Gallium Garnet substrates at different growth conditions. Atomic force microscopy showed flat surface morphology both on micrometer and nanometer scales. X-ray diffraction measurements revealed that the films are coherent with the substrate in the interface plane. The interplane distance in the [111] direction was found to be by 1.2% larger than expected for YIG stoichiometric pseudomorphic film indicating presence of rhombohedral distortion in this direction. Polar Kerr effect and ferromagnetic resonance measurements showed existence of additional magnetic anisotropy, which adds to the demagnetizing field to keep magnetization vector in the film plane. The origin of the magnetic anisotropy is related to the strain in YIG films observed by XRD. Magneto-optical Kerr effect measurements revealed important role of magnetization rotation during magnetization reversal. An unusual fine structure of microwave magnetic resonance spectra has been observed in the film grown at reduced (0.5 mTorr) oxygen pressure. Surface spin wave propagation has been demonstrated in the in-plane magnetized films.

  6. Structural and Optical Properties of ZnO Films with Different Thicknesses Grown on Sapphire by MOCVD

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    ZnO(002) films with different thicknesses, grown on Al2O3 (006) substrates by metal-organic chemical vapor deposition( MOCVD), were etched by Ar ion beams. The samples were examined by D8 X-ray diffraction, scanning electron microscopy(SEM), and photoluminescence (PL) spectrometry. The structural properties vary with the increasing thickness of the films. When the film thickness is thin, the phi(Φ) scanning curves for ZnO(103) and sapphire(116) substrate show the existence of two kinds of orientation relationships between ZnO films and sapphire,which are ZnO(002)//Al2O3 (006), ZnO(100)//Al2O3 (110) and ZnO(002)//Al2O3 (006), ZnO(110)//Al2O3(110). When the thickness increases to 500 nm there is only one orientation relationship, which is ZnO(002)//Al2O3 (006), ZnO [ 100 ]//Al2O3[ 110 ]. Their photoluminescence (PL) spectra at room temperature show that the optical properties of ZnO films have been greatly improved when increasing the thickness of films is increased.

  7. Engineering the mechanical properties of ultrabarrier films grown by atomic layer deposition for the encapsulation of printed electronics

    Energy Technology Data Exchange (ETDEWEB)

    Bulusu, A.; Singh, A.; Kim, H. [Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Wang, C. Y.; Dindar, A.; Fuentes-Hernandez, C.; Kippelen, B. [School of Electrical and Computer Engineering, Georgia Institute of Technology, and Center for Organic Photonics and Electronics, Atlanta, Georgia 30332 (United States); Cullen, D. [Oak Ridge National Laboratory, P.O. Box 2008 MS-6064, Oak Ridge, Tennessee 37831 (United States); Graham, S., E-mail: sgraham@gatech.edu [Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Oak Ridge National Laboratory, P.O. Box 2008 MS-6064, Oak Ridge, Tennessee 37831 (United States)

    2015-08-28

    Direct deposition of barrier films by atomic layer deposition (ALD) onto printed electronics presents a promising method for packaging devices. Films made by ALD have been shown to possess desired ultrabarrier properties, but face challenges when directly grown onto surfaces with varying composition and topography. Challenges include differing nucleation and growth rates across the surface, stress concentrations from topography and coefficient of thermal expansion mismatch, elastic constant mismatch, and particle contamination that may impact the performance of the ALD barrier. In such cases, a polymer smoothing layer may be needed to coat the surface prior to ALD barrier film deposition. We present the impact of architecture on the performance of aluminum oxide (Al{sub 2}O{sub 3})/hafnium oxide (HfO{sub 2}) ALD nanolaminate barrier films deposited on fluorinated polymer layer using an optical calcium (Ca) test under damp heat. It is found that with increasing polymer thickness, the barrier films with residual tensile stress are prone to cracking resulting in rapid failure of the Ca sensor at 50 °C/85% relative humidity. Inserting a SiN{sub x} layer with residual compressive stress between the polymer and ALD layers is found to prevent cracking over a range of polymer thicknesses with more than 95% of the Ca sensor remaining after 500 h of testing. These results suggest that controlling mechanical properties and film architecture play an important role in the performance of direct deposited ALD barriers.

  8. Engineering the mechanical properties of ultrabarrier films grown by atomic layer deposition for the encapsulation of printed electronics

    Science.gov (United States)

    Bulusu, A.; Singh, A.; Wang, C. Y.; Dindar, A.; Fuentes-Hernandez, C.; Kim, H.; Cullen, D.; Kippelen, B.; Graham, S.

    2015-08-01

    Direct deposition of barrier films by atomic layer deposition (ALD) onto printed electronics presents a promising method for packaging devices. Films made by ALD have been shown to possess desired ultrabarrier properties, but face challenges when directly grown onto surfaces with varying composition and topography. Challenges include differing nucleation and growth rates across the surface, stress concentrations from topography and coefficient of thermal expansion mismatch, elastic constant mismatch, and particle contamination that may impact the performance of the ALD barrier. In such cases, a polymer smoothing layer may be needed to coat the surface prior to ALD barrier film deposition. We present the impact of architecture on the performance of aluminum oxide (Al2O3)/hafnium oxide (HfO2) ALD nanolaminate barrier films deposited on fluorinated polymer layer using an optical calcium (Ca) test under damp heat. It is found that with increasing polymer thickness, the barrier films with residual tensile stress are prone to cracking resulting in rapid failure of the Ca sensor at 50 °C/85% relative humidity. Inserting a SiNx layer with residual compressive stress between the polymer and ALD layers is found to prevent cracking over a range of polymer thicknesses with more than 95% of the Ca sensor remaining after 500 h of testing. These results suggest that controlling mechanical properties and film architecture play an important role in the performance of direct deposited ALD barriers.

  9. SnO{sub 2} thin films grown by atomic layer deposition using a novel Sn precursor

    Energy Technology Data Exchange (ETDEWEB)

    Choi, Min-Jung [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 (Korea, Republic of); Cho, Cheol Jin [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Department of Materials Science and Engineering, Seoul National University, Seoul, 151-744 (Korea, Republic of); Kim, Kwang-Chon; Pyeon, Jung Joon [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Park, Hyung-Ho [Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749 (Korea, Republic of); Kim, Hyo-Suk; Han, Jeong Hwan; Kim, Chang Gyoun; Chung, Taek-Mo [Division of Advanced Materials, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-600 (Korea, Republic of); Park, Tae Joo [Department of Materials Science and Engineering, Hanyang University, Ansan, 426-791 (Korea, Republic of); Kwon, Beomjin [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Jeong, Doo Seok; Baek, Seung-Hyub [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Department of Nanomaterials, Korea University of Science and Technology, Daejeon, 305-333 (Korea, Republic of); Kang, Chong-Yun; Kim, Jin-Sang [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Kim, Seong Keun, E-mail: s.k.kim@kist.re.kr [Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 136-791 (Korea, Republic of); Department of Nanomaterials, Korea University of Science and Technology, Daejeon, 305-333 (Korea, Republic of)

    2014-11-30

    Highlights: • We developed a new ALD process for SnO{sub 2} films using dimethylamino-2-methyl-2-propoxy-tin(II) as a novel Sn precursor. • The SnO{sub 2} films grown from Sn(dmamp){sub 2} has negligible impurity contents. • Sn ions in the films had a single binding state corresponding to Sn{sup 4+} in SnO{sub 2}. - Abstract: SnO{sub 2} thin films were grown by atomic layer deposition (ALD) with dimethylamino-2-methyl-2-propoxy-tin(II) (Sn(dmamp){sub 2}) and O{sub 3} in a temperature range of 100–230 °C. The ALD window was found to be in the range of 100–200 °C. The growth per cycle of the films in the ALD window increased with temperature in the range from 0.018 to 0.042 nm/cycle. Above 230 °C, the self-limiting behavior which is a unique characteristic of ALD, was not observed in the growth because of the thermal decomposition of the Sn(dmamp){sub 2} precursor. The SnO{sub 2} films were amorphous in the ALD window and exhibited quite a smooth surface. Sn ions in all films had a single binding state corresponding to Sn{sup 4+} in SnO{sub 2}. The concentration of carbon and nitrogen in the all SnO{sub 2} films was below the detection limit of the auger electron spectroscopy technique and a very small amount of carbon, nitrogen, and hydrogen was detected by secondary ions mass spectroscopy only. The impurity contents decreased with increasing the growth temperature. This is consistent with the increase in the density of the SnO{sub 2} films with respect to the growth temperature. The ALD process with Sn(dmamp){sub 2} and O{sub 3} shows excellent conformality on a hole structure with an aspect ratio of ∼9. This demonstrates that the ALD process with Sn(dmamp){sub 2} and O{sub 3} is promising for growth of robust and highly pure SnO{sub 2} films.

  10. Magnetic and structural properties of Co{sub 2}FeAl thin films grown on Si substrate

    Energy Technology Data Exchange (ETDEWEB)

    Belmeguenai, Mohamed, E-mail: belmeguenai.mohamed@univ-paris13.fr [LSPM (CNRS-UPR 3407) 99 Avenue Jean-Baptiste Clément Université Paris 13, 93430 Villetaneuse (France); Tuzcuoglu, Hanife [LSPM (CNRS-UPR 3407) 99 Avenue Jean-Baptiste Clément Université Paris 13, 93430 Villetaneuse (France); Gabor, Mihai; Petrisor, Traian [Center for Superconductivity, Spintronics and Surface Science, Technical University of Cluj-Napoca, Street Memorandumului No. 28, RO-400114 Cluj-Napoca (Romania); Tiusan, Coriolan [Center for Superconductivity, Spintronics and Surface Science, Technical University of Cluj-Napoca, Street Memorandumului No. 28, RO-400114 Cluj-Napoca (Romania); Institut Jean Lamour, CNRS, Université de Nancy, BP 70239, F-54506 Vandoeuvre (France); Berling, Dominique [IS2M (CNRS-LRC 7228), 15 rue Jean Starcky, Université de Haute-Alsace, BP 2488, 68057 Mulhouse-Cedex (France); Zighem, Fatih; Mourad Chérif, Salim [LSPM (CNRS-UPR 3407) 99 Avenue Jean-Baptiste Clément Université Paris 13, 93430 Villetaneuse (France)

    2015-01-01

    The correlation between magnetic and structural properties of Co{sub 2}FeAl (CFA) thin films of different thicknesses (10 nmgrown at room temperature on MgO-buffered Si/SiO{sub 2} substrates and annealed at 600 °C has been studied. x-ray diffraction (XRD) measurements revealed an (011) out-of-plane textured growth of the films. The deduced lattice parameter increases with the film thickness. Moreover, pole figures showed no in-plane preferential growth orientation. The magneto-optical Kerr effect hysteresis loops showed the presence of a weak in-plane uniaxial anisotropy with a random easy axis direction. The coercive field, measured with the applied field along the easy axis direction, and the uniaxial anisotropy field increase linearly with the inverse of the CFA thickness. The microstrip line ferromagnetic resonance measurements for in-plane and perpendicular applied magnetic fields revealed that the effective magnetization and the uniaxial in-plane anisotropy field follow a linear variation versus the inverse CFA thickness. This allows deriving a perpendicular surface anisotropy coefficient of −1.86 erg/cm{sup 2}. - Highlights: • Various Co{sub 2}FeAl thin films were grown on a Si(001) substrates and annealed at 600 °C. • The thickness dependence of magnetic and structural properties has been studied. • X-ray measurements revealed an (011) out-of-plane textured growth of the films. • The easy axis coercive field varies linearly with the inverse CFA thickness. • The effective magnetization increases linearly with the inverse film thickness.

  11. Information in CDS Spreads

    NARCIS (Netherlands)

    L. Norden (Lars)

    2014-01-01

    textabstractWe investigate how public and private information drives corporate CDS spreads before rating announcements. We find that CDS spreads of firms with higher news intensity move significantly earlier and stronger before rating announcements, which can be explained with public information fro

  12. Bonding structure and morphology of chromium oxide films grown by pulsed-DC reactive magnetron sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Gago, R., E-mail: rgago@icmm.csic.es [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid (Spain); Vinnichenko, M. [Fraunhofer-Institut für Keramische Technologien und Systeme IKTS, D-01277 Dresden (Germany); Hübner, R. [Helmholtz-Zentrum Dresden – Rossendorf, Institute of Ion Beam Physics and Materials Research, Bautzner Landstraße 400, 01328 Dresden (Germany); Redondo-Cubero, A. [Departamento de Física Aplicada and Centro de Microanálisis de Materiales, Universidad Autónoma de Madrid, E-28049 Madrid (Spain)

    2016-07-05

    Chromium oxide (CrO{sub x}) thin films were grown by pulsed-DC reactive magnetron sputter deposition in an Ar/O{sub 2} discharge as a function of the O{sub 2} fraction in the gas mixture (ƒ) and for substrate temperatures, T{sub s}, up to 450 °C. The samples were analysed by Rutherford backscattering spectrometry (RBS), spectroscopic ellipsometry (SE), atomic force microscopy (AFM), scanning (SEM) and transmission (TEM) electron microscopy, X-ray diffraction (XRD), and X-ray absorption near-edge structure (XANES). On unheated substrates, by increasing ƒ the growth rate is higher and the O/Cr ratio (x) rises from ∼2 up to ∼2.5. Inversely, by increasing T{sub s} the atomic incorporation rate drops and x falls to ∼1.8. XRD shows that samples grown on unheated substrates are amorphous and that nanocrystalline Cr{sub 2}O{sub 3} (x = 1.5) is formed by increasing T{sub s}. In amorphous CrO{sub x}, XANES reveals the presence of multiple Cr environments that indicate the growth of mixed-valence oxides, with progressive promotion of hexavalent states with ƒ. XANES data also confirms the formation of single-phase nanocrystalline Cr{sub 2}O{sub 3} at elevated T{sub s}. These structural changes also reflect on the optical and morphological properties of the films. - Highlights: • XANES of CrO{sub x} thin films grown by pulsed-DC reactive magnetron sputtering. • Identification of mixed-valence amorphous CrO{sub x} oxides on unheated substrates. • Promotion of amorphous chromic acid (Cr{sup VI}) by increasing O{sub 2} partial pressure. • Production of single-phase Cr{sub 2}O{sub 3} films by increasing substrate temperature. • Correlation of bonding structure with morphological and optical properties.

  13. Understanding misfit strain releasing mechanisms via molecular dynamics simulations of CdTe growth on {112}zinc-blende CdS

    Science.gov (United States)

    Zhou, X. W.; Chavez, J. J.; Almeida, S.; Zubia, D.

    2016-07-01

    Molecular dynamics simulations have been used to analyse microstructures of CdTe films grown on {112} surfaces of zinc-blende CdS. Interestingly, CdTe films grow in ⟨331⟩ orientations as opposed to ⟨112⟩ epitaxial orientations. At the CdTe-{331}/CdS-{112} interface, however, there exists an axis that is parallel to the ⟨110⟩ orientation of both CdS and CdTe. It is the direction orthogonal to this ⟨110⟩ that becomes different, being ⟨116⟩ for CdTe and ⟨111⟩ for CdS, respectively. Missing CdTe-{110} planes are found along the ⟨110⟩ axis, suggesting that the misfit strain is released by the conventional misfit dislocation mechanism along this axis. In the orthogonal axis, the misfit strain is found to be more effectively released by the new grain orientation mechanism. Our finding is supported by literature experimental observations of the change of growth direction when Cd0.96Zn0.04Te films are deposited on GaAs. Analyses of energetics clearly demonstrate the cause for the formation of the new orientation, and the insights gained from our studies can help understand the grain structures experimentally observed in lattice mismatched systems.

  14. Optical properties and structure of HfO{sub 2} thin films grown by high pressure reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    MartInez, F L [Departamento de Electronica y TecnologIa de Computadoras, Universidad Politecnica de Cartagena, Campus Universitario Muralla del Mar, E-30202 Cartagena (Spain); Toledano-Luque, M [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28040 Madrid (Spain); GandIa, J J [Departamento de EnergIa, CIEMAT, Avda. Complutense 22, E-28040 Madrid (Spain); Carabe, J [Departamento de EnergIa, CIEMAT, Avda. Complutense 22, E-28040 Madrid (Spain); Bohne, W [Hahn-Meitner-Institut Berlin, Abteilung SF4, D-14109 Berlin (Germany); Roehrich, J [Hahn-Meitner-Institut Berlin, Abteilung SF4, D-14109 Berlin (Germany); Strub, E [Hahn-Meitner-Institut Berlin, Abteilung SF4, D-14109 Berlin (Germany); Martil, I [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28040 Madrid (Spain)

    2007-09-07

    Thin films of hafnium oxide (HfO{sub 2}) have been grown by high pressure reactive sputtering on transparent quartz substrates (UV-grade silica) and silicon wafers. Deposition conditions were adjusted to obtain polycrystalline as well as amorphous films. Optical properties of the films deposited on the silica substrates were investigated by transmittance and reflectance spectroscopy in the ultraviolet, visible and near infrared range. A numerical analysis method that takes into account the different surface roughness of the polycrystalline and amorphous films was applied to calculate the optical constants (refractive index and absorption coefficient). Amorphous films were found to have a higher refractive index and a lower transparency than polycrystalline films. This is attributed to a higher density of the amorphous samples, which was confirmed by atomic density measurements performed by heavy-ion elastic recoil detection analysis. The absorption coefficient gave an excellent fit to the Tauc law (indirect gap), which allowed a band gap value of 5.54 eV to be obtained. The structure of the films (amorphous or polycrystalline) was found to have no significant influence on the nature of the band gap. The Tauc plots also give information about the structure of the films, because the slope of the plot (the Tauc parameter) is related to the degree of order in the bond network. The amorphous samples had a larger value of the Tauc parameter, i.e. more order than the polycrystalline samples. This is indicative of a uniform bond network with percolation of the bond chains, in contrast to the randomly oriented polycrystalline grains separated by grain boundaries.

  15. CdS薄膜的制备及其在CdTe电池中的应用%Preparation of CdS films and their application in CdTe solar cells

    Institute of Scientific and Technical Information of China (English)

    韩俊峰; 廖成; 江涛; 赵夔

    2011-01-01

    The CdTe solar cell is one of the most popular thin film PV devices, and CdS is used as a suitable window layer for CdTe-based photovoltaic systems. The CdS films here were prepared by chemical bath depostion (CBD) and closed space sublimation (CSS). The complete CdTe/CdS solar cell devices were fabricated and analyzed. It was found that the films prepared by the CSS method have larger grains and better optical/electrical properties. The photoelectric conversion efficiency of such a solar cell comes up to 10.9%. The films deposited by CSS method is fast in vacuum system and suitable for commercial applications.%CdTe薄膜电池是发展最快、应用前景最好的一类太阳能电池.CdS层是CdTe电池的窗口层材.料,其薄膜质量直接影响电池的转换效率.本文介绍了化学水浴沉积(CBD)和闭空间升华(CSS)两种方法沉积CdS薄膜,并完成单电池器件的制备和测试.CSS方法制备的薄膜结晶较大,光学和电学性能好于CBD方法制备的薄膜,太阳能电池的光电转换效率达到10.9%.CSS方法镀膜速度快,真空环境工作,有利于大规模产业化应用.

  16. Perpendicular magnetic anisotropy of Au/FePt thin films grown on Si substrates

    CERN Document Server

    Lee, Y W; Kim, C O

    1999-01-01

    FePt thin films show in plane magnetism with a very large coercive force when they are deposited on lattice-mismatched substrates, such as glass or Si In our research, FePt alloy thin films were deposited, using the coevaporation method, on a Au buffer layer which was evaporated onto a Si substrate at 500 .deg. C. The magnetic easy axis of the FePt film changed from the in-plane direction to the normal direction of the film. Therefore, it can be said that a Au buffer layer can enhance the perpendicular magnetic anisotropy of a FePt thin film on a lattice-mismatched substrate.

  17. Fabrication and Photoelectrochemical Performance of CdS Quantum Dots Sensitized TiO2 Film Electrodes%CdS量子点敏化TiO2薄膜电极的制备和光电化学性能

    Institute of Scientific and Technical Information of China (English)

    周婧; 赵高凌; 臧金鑫; 宋斌; 李红; 韩高荣

    2011-01-01

    用水热微乳法制备了结晶性良好的CdS量子点,并通过连接分子巯基乙酸将CdS量子点自组装到多孔TiO2薄膜电极上.结果表明:CdS纳米颗粒的平均直径约为5nm,小于其量子尺寸;微乳体系为化学反应提供了良好的微型反应器,抑制了CdS晶粒的长大,而水热过程增强了CdS纳米颗粒的结晶性;由于CdS的可见光响应作用和CdS量子点的量子效应,CdS量子点敏化TiO2薄膜电极样品具有比纯TiO2薄膜电极样品更高的可见光响应和光电流.讨论了CdS量子点通过连接分子组装到TiO2薄膜上的机理.%The CdS quantum dots (QDs) material was prepared by a microemulsion-hydrothermal method. This material was self-assembled onto the porous TiO2 film electrode with the molecular linker mercaptoacetic acid. The results show that the average diameter of CdS nanoparticles is approximately 5 nm, which is below the quantum size of CdS. The current microemulsion system provided a micro-reactor for the reaction, inhibiting the growth of CdS crystallite. The hydrothermal process enhanced the crystallization of CdS nanoparticles. The porous TiO2 film sensitized by the self-assembled microemulsion-hydrothermal method with the CdS QDs material gave a higher photoresponse in the visible region and the corresponding film electrode exhibited a higher photocurrent than that of a pure TiO2 film electrode. This was ascribed to both the visible light response of CdS and the quantum effect of CdS QDs. The mechanism of CdS QDs self-assembling onto the porous TiO2 film electrode with the intermediate mercaptoacetic acid wasalso discussed.

  18. Optical and electrical properties of high-quality Ti2O3 epitaxial film grown on sapphire substrate

    Science.gov (United States)

    Fan, Haibo; Wang, Mingzi; Yang, Zhou; Ren, Xianpei; Yin, Mingli; Liu, Shengzhong

    2016-11-01

    Epitaxial film of Ti2O3 with high crystalline quality was grown on Al2O3 substrate by pulsed laser deposition process using a powder-pressed TiO2 target in active O2 flow. X-ray diffraction clearly reveals the (0006) crystalline Ti2O3 orientation and its (10overline{1} 0)_{{{{Ti}}_{ 2} {{O}}_{ 3} }} ||(10overline{1} 0)_{{sapphire}} in-plane epitaxial relationship with the substrate. Scanning electron microscopy images show that the film grew uniformly on the substrate with a Volmer-Weber mode. High-resolution transmission electron microscopy and selected area electron diffraction further confirm the high crystalline quality of the film. Transmittance spectrum shows that the Ti2O3 film is highly transparent in 400-800 nm with the optical band gap estimated to be 3.53 eV by Tauc plot. The temperature-dependent Hall effect measurement indicates that the Ti2O3 film appears to be n-type semiconductor with carrier concentration, mobility, and resistivity showing typical temperature-dependent behavior. The donor ionization energy was estimated to be 83.6 meV by linear relationship of conductivity versus temperature.

  19. Structural, Optical Constants and Photoluminescence of ZnO Thin Films Grown by Sol-Gel Spin Coating

    Directory of Open Access Journals (Sweden)

    Abdel-Sattar Gadallah

    2013-01-01

    Full Text Available We report manufacturing and characterization of low cost ZnO thin films grown on glass substrates by sol-gel spin coating method. For structural properties, X-ray diffraction measurements have been utilized for evaluating the dominant orientation of the thin films. For optical properties, reflectance and transmittance spectrophotometric measurements have been done in the spectral range from 350 nm to 2000 nm. The transmittance of the prepared thin films is 92.4% and 88.4%. Determination of the optical constants such as refractive index, absorption coefficient, and dielectric constant in this wavelength range has been evaluated. Further, normal dispersion of the refractive index has been analyzed in terms of single oscillator model of free carrier absorption to estimate the dispersion and oscillation energy. The lattice dielectric constant and the ratio of free carrier concentration to free carrier effective mass have been determined. Moreover, photoluminescence measurements of the thin films in the spectral range from 350 nm to 900 nm have been presented. Electrical measurements for resistivity evaluation of the films have been done. An analysis in terms of order-disorder of the material has been presented to provide more consistency in the results.

  20. Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition

    Science.gov (United States)

    Hazra, D.; Tsavdaris, N.; Jebari, S.; Grimm, A.; Blanchet, F.; Mercier, F.; Blanquet, E.; Chapelier, C.; Hofheinz, M.

    2016-10-01

    Niobium nitride (NbN) is widely used in high-frequency superconducting electronics circuits because it has one of the highest superconducting transition temperatures ({T}{{c}}˜ 16.5 {{K}}) and largest gap among conventional superconductors. In its thin-film form, the T c of NbN is very sensitive to growth conditions and it still remains a challenge to grow NbN thin films (below 50 nm) with high T c. Here, we report on the superconducting properties of NbN thin films grown by high-temperature chemical vapor deposition (HTCVD). Transport measurements reveal significantly lower disorder than previously reported, characterized by a Ioffe-Regel parameter ({k}{{F}}{\\ell }) ˜ 12. Accordingly we observe {T}{{c}}˜ 17.06 {{K}} (point of 50% of normal state resistance), the highest value reported so far for films of thickness 50 nm or less, indicating that HTCVD could be particularly useful for growing high quality NbN thin films.

  1. Structural properties of strained YBa2Cu3O6+x superconducting films grown by pulsed laser deposition

    Science.gov (United States)

    Ariosa, Daniel; Abrecht, M.; Pavuna, Davor; Onellion, Marshall

    2000-09-01

    In YBa2Cu3O6+x compound the tetragonal to orthorhombic transition occurs around x equals 0.3, followed by a continuum variation of lattice parameters. Hence both, the structural and superconducting properties, depend upon the oxygen content in CuO chains. Conversely, the epitaxial stress, exerted by the substrate on YBCO films, modified the lattice parameters influencing the oxygen stability in the chains. The understanding of this mechanism is essential when growing epitaxial films for in- situ photoemission studies as well as for tunneling experiments, since the oxygen stability up to the top surface unit-cell is a central issue. We have studied this effect on c-axis oriented YBCO films grown by laser ablation on (001) STO single crystals. Accurate x-ray diffraction analysis of thick films (t GRT 500 angstrom) indicates the presence of two distinct layers, one strained and the other relaxed. Detailed analysis shows that the relaxed layer is as well oxidized as bulk samples, while the strained one is oxygen deficient. Furthermore, despite an oxygen content of about x equals 0.65, the strained layer is in the tetragonal phase (in bulk, the tetragonal phase exists for x < 0.3). We discuss these results in terms of competition between the chemical pressure induced by oxygen inclusion in the chains, and the uniaxial stress within the film.

  2. Thickness-Dependent Properties of YBCO Films Grown on GZO/CLO-Buffered NiW Substrates

    Science.gov (United States)

    Malmivirta, M.; Huhtinen, H.; Zhao, Y.; Grivel, J.-C.; Paturi, P.

    2017-01-01

    To study the role of novel Gd_2Zr_2O_7/Ce_{0.9}La_{0.1}O_2 buffer layer structure on a biaxially textured NiW substrate, a set of YBa_2Cu_3O_{7-δ } (YBCO) films with different thicknesses were prepared by pulsed laser deposition (PLD). Interface imperfections as well as thickness-dependent structural properties were observed in the YBCO thin films. The structure is also reflected into the improved superconducting properties with the highest critical current densities in films with intermediate thicknesses. Therefore, it can be concluded that the existing buffer layers need more optimization before they can be successfully used for films with various thicknesses. This issue is linked to the extremely susceptible growth method of PLD when compared to the commonly used chemical deposition methods. Nevertheless, PLD-grown films can give a hint on what to concentrate to be able to further improve the buffer layer structures for future coated conductor technologies.

  3. Influence of an External Magnetic Field on the Growth of Nanocrystalline Silicon Films Grown by MF Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Junhua Gao; Lin Zhang; Jinquan Xiao; Jun Gong; Chao Sun; Lishi Wen

    2012-01-01

    The effects of an external magnetic field originating from two solenoid coils on the magnetic field configuration, plasma state of a dual unbalanced magnetron sputter system and the structure of nanocrystalline Si films were examined. Numerical simulations of the magnetic field configuration showed that increasing the coil current significantly changed the magnetic field distribution between the substrate and targets. The saturated ion current density Ji in the substrate position measured by using a circular flat probe increased from 0.18 to 0.55 mA/cm2 with the coil current ranging from 0 to 6 A. X-ray diffraction and Raman results revealed that increasing the ion density near the substrate would benefit crystallization of films and the preferential growth along [lI1] orientation. From analysis of the surface morphology and the microstructure of Si films grown under different plasma conditions, it is found that with increasing the Ji, the surface of the film was smoothed and the alteration in the surface roughness was mainly correlated to the localized surface diffusion of the deposited species and the crystallization behavior of the films.

  4. Magnetic and Optical Properties of the TiO2-Co-TiO2 Composite Films Grown by Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    LIU Fa-min; DING Peng; SHI Wei-mei; WANG Tian-min

    2007-01-01

    The TiO2-Co-TiO2 sandwich films were successfully grown on glass and silicon substrata making alternate use of radio frequency reactive magnetron sputtering and direct current magnetron sputtering. The structures and properties of these films were identified with X-ray diffraction (XRD), Raman spectra and X-ray photoemission spectra (XPS). It is shown that the sandwich film consists of two anatase TiO2 films with an embedded Co nano-film. The fact that, when the Co nano-film thickens, varied red shifts appear in optical absorption spectra may well be explained by the quantum confinement and tunnel effects. As for magnetic properties, the saturation magnetization, remnant magnetic induction and coercivity vary with the thickness of the Co nano-films. Moreover, the Co nano-film has a critical thickness of about 8.6 nm, which makes the coercivity of the composite film reach the maximum of about 1413 Oe.

  5. The effects of thermal annealing on the structure and the electrical transport properties of ultrathin gadolinia-doped ceria films grown by pulsed laser deposition

    DEFF Research Database (Denmark)

    Rodrigo, Katarzyna Agnieszka; Heiroth, S.; Pryds, Nini;

    2011-01-01

    Ultrathin crystalline films of 10 mol% gadolinia-doped ceria (CGO10) are grown on MgO (100) substrates by pulsed laser deposition at a moderate temperature of 400°C. As-deposited CGO10 layers of approximately 4 nm, 14 nm, and 22 nm thickness consist of fine grains with dimensions ≤∼11 nm. The films...

  6. Electrical and physicochemical properties of atomic-layer-deposited HfO{sub 2} film on Si substrate with interfacial layer grown by nitric acid oxidation

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Seung Hyun [Department of Advanced Materials Engineering, Hanyang University, Ansan 15588 (Korea, Republic of); Seok, Tae Jun; Jin, Hyun Soo [Department of Materials Science & Chemical Engineering, Hanyang University, Ansan 15588 (Korea, Republic of); Kim, Woo-Byoung, E-mail: woo7838@dankook.ac.kr [Department of Energy Engineering, Dankook University, Cheonan 330-714 (Korea, Republic of); Park, Tae Joo, E-mail: tjp@hanyang.ac.kr [Department of Advanced Materials Engineering, Hanyang University, Ansan 15588 (Korea, Republic of); Department of Materials Science & Chemical Engineering, Hanyang University, Ansan 15588 (Korea, Republic of)

    2016-03-01

    Graphical abstract: - Highlights: • Ultrathin SiO{sub 2} interfacial layers grown using nitric acid oxidation and O{sub 3} oxidation were adopted at the interface of HfO{sub 2}/Si. • Higher physical density of interfacial layer grown using nitric acid oxidation resulted in the suppressed Si diffusion from substrate into the film. • The interface properties as well as permittivity of the film were improved by adoption of interfacial layer grown using nitric acid oxidation. - Abstract: The ultrathin SiO{sub 2} interfacial layer (IL) was adopted at the interface between atomic-layer-deposited HfO{sub 2} gate dielectric film and a Si substrate, which was grown using nitric acid oxidation (NAO) and O{sub 3} oxidation (OZO) prior to HfO{sub 2} film deposition. X-ray photoelectron spectroscopy result revealed that Si diffusion from the substrate into the film was suppressed for the film with NAO compared to that with OZO, which was attributed to the higher physical density of IL. The electrical measurement using metal–insulator–semiconductor devices showed that the film with NAO exhibited higher effective permittivity and lower densities of fixed charge and slow state at the interface. Furthermore, the leakage current density at an equivalent electrical thickness was lower for the film with NAO than OZO.

  7. Cw and time-resolved spectroscopy in homoepitaxial GaN films and GaN-GaAlN quantum wells grown by molecular beam epitaxy.

    OpenAIRE

    Taliercio, Thierry; Gallart, Mathieu; Lefebvre, Pierre; Morel, Aurélien; Gil, Bernard; Allègre, Jacques; Grandjean, Nicolas; Massies, Jean; Grzegory, Izabella; Porowsky, Sylvester

    2001-01-01

    International audience; We have grown GaN films and GaN–AlGaN quantum wells (QWs) on homoepitaxial substrates, by molecular beam epitaxy using ammonia. Both the GaN film and the QW are found to have superior excitonic recombination properties which are extremely promising for the development of indium free ultra-violet lasers based on nitrides.

  8. Optical, structural, and electrical properties of Mg2NiH4 thin films in situ grown by activated reactive evaporation

    NARCIS (Netherlands)

    Westerwaal, R. J.; Slaman, M.; Broedersz, C. P.; Borsa, D. M.; Dam, B.; Griessen, R.; Borgschulte, A.; Lohstroh, W.; Kooi, B.; ten Brink, Gert; Tschersich, K. G.; Fleischhauer, H. P.

    2006-01-01

    Mg2NiH4 thin films have been prepared by activated reactive evaporation in a molecular beam epitaxy system equipped with an atomic hydrogen source. The optical reflection spectra and the resistivity of the films are measured in situ during deposition. In situ grown Mg2NiH4 appears to be stable in

  9. Optical characterization of CdS nanorods capped with starch

    Science.gov (United States)

    Roy, J. S.; Pal Majumder, T.; Schick, C.

    2015-05-01

    Well crystalline uniform CdS nanorods were grown by changing the concentration of maize starch. The highly polymeric (branched) structure of starch enhances the growth of CdS nanorods. The average diameter of the nanorods is 20-25 nm while length is of 500-600 nm as verified from SEM and XRD observations. The optical band gaps of the CdS nanorods are varying from 2.66 eV to 2.52 eV depending on concentration of maize starch. The photoluminescence (PL) emission bands are shifted from 526 nm to 529 nm with concentration of maize starch. We have also observed the enhanced PL intensity in CdS nanorods capped with starch. The Fourier transform infrared (FTIR) spectroscopy shows the significant effect of starch on CdS nanorods.

  10. CdTe solar cell degradation studies with the use of CdS as the window material

    Energy Technology Data Exchange (ETDEWEB)

    Mendoza-Perez, R. [Universidad Autonoma de la Ciudad de Mexico, Av. Prolongacion San Isidro Num. 151, Col. San Lorenzo Tezonco, C.P. 09790 Mexico, D.F. (Mexico); Escuela Superior de Fisica y Matematicas del IPN., Edificio 9, U.P.A.L.M., Col. Lindavista, C.P. 07738 Mexico, D.F. (Mexico); Sastre-Hernandez, J.; Contreras-Puente, G.; Vigil-Galan, O. [Escuela Superior de Fisica y Matematicas del IPN., Edificio 9, U.P.A.L.M., Col. Lindavista, C.P. 07738 Mexico, D.F. (Mexico)

    2009-01-15

    We present in this work the degradation effects with time in thin film CdTe/CdS solar cells, where the CdS and CdTe layers are deposited by chemical bath deposition (CBD) and close space vapor transport (CSVT), respectively. The CdS thin films were grown from different baths by varying the S/Cd ratio. The variation of the S/Cd ratio allowed us to control the morphology and the density of defects, thus giving rise to better quality CBD CdS films. Depending on the S/Cd ratio an improvement of the morphology and capacitance signal was observed, these factors have also an influence on the open-circuit voltage, short-circuit current density, fill factor and conversion efficiency of the solar cell. The variation with time of these parameters in our devices was tracked during a period of 3 years measured directly on the exposed back contact regions (CdTe/Cu/Au). A discussion on the deterioration of the photovoltaic (PV) performance of the solar cells is presented in correlation with the local environmental conditions. This particular environment has contamination, and represents another type of stress for standard PV operations. These conditions reduce the mean life time of solar cells beyond short periods; this can be of interest for PV community. (author)

  11. Microstructural and conductivity comparison of Ag films grown on amorphous TiO2 and polycrystalline ZnO

    Energy Technology Data Exchange (ETDEWEB)

    Dannenberg, Rand; Stach, Eric; Glenn, Darin; Sieck, Peter; Hukari, Kyle

    2001-03-26

    8 nm thick Ag films were sputter deposited onto amorphous TiO{sub 2} underlayers 25 nm thick, and also amorphous TiO{sub 2} (25 nm)/ZnO (5 nm) multiunderlayers. The substrates were back-etched Si with a 50 nm thick LPCVD Si{sub 3}N{sub 4} electron transparent membrane. The ZnO, sputtered onto amorphous TiO{sub 2}, formed a continuous layer with a grain size of 5 nm in diameter, on the order of the film thickness. There are several microstructural differences in the Ag dependent on the underlayers, revealed by TEM. First a strong {l_brace}0001{r_brace} ZnO to {l_brace}111{r_brace} Ag fibre-texture relationship exists. On TiO{sub 2} the Ag microstructure shows many abnormal grains whose average diameter is about 60-80 nm, whereas the films on ZnO show few abnormal grains. The background matrix of normal grains on the TiO{sub 2} is roughly 15 nm, while the normal grain size on the ZnO is about 25 nm. Electron diffraction patterns show that the film on ZnO has a strong {l_brace}111{r_brace} orientation, and dark field images with this diffraction condition have a grain size of about 30 nm. In a region near the center of the TEM grid where there is the greatest local heating during deposition, Ag films grown on amorphous TiO{sub 2} are discontinuous, whereas on ZnO, the film is continuous. When films 8 nm films are grown on solid glass substrates, those with ZnO underlayers have sheet resistances of 5.68 {Omega}/, whereas those on TiO{sub 2} are 7.56 {Omega}/, and when 16 nm thick, the corresponding sheet resistances are 2.7 {Omega}/ and 3.3 {Omega}/. The conductivity difference is very repeatable. The improved conductivity is thought to be a combined effect of reduced grain boundary area per unit volume, the predominance of low grain boundary resistivity Coincidence Site Lattice boundaries from the Ag {l_brace}111{r_brace} orientation, and Ag planarization on ZnO resulting in less groove formation on deposition, concluded from atomic force microscopy.

  12. High-quality β-Ga2O3 single crystals grown by edge-defined film-fed growth

    Science.gov (United States)

    Kuramata, Akito; Koshi, Kimiyoshi; Watanabe, Shinya; Yamaoka, Yu; Masui, Takekazu; Yamakoshi, Shigenobu

    2016-12-01

    β-Ga2O3 bulk crystals were grown by the edge-defined film-fed growth (EFG) process and the floating zone process. Semiconductor substrates containing no twin boundaries with sizes up to 4 in. in diameter were fabricated. It was found that Si was the main residual impurity in the EFG-grown crystals and that the effective donor concentration (N d - N a) of unintentionally doped crystals was governed by the Si concentration. Intentional n-type doping was shown to be possible. An etch pit observation revealed that the dislocation density was on the order of 103 cm-3. N d - N a for the samples annealed in nitrogen ambient was almost the same as the Si concentration, while for the samples annealed in oxygen ambient, it was around 1 × 1017 cm-3 and independent of the Si concentration.

  13. Preparation and properties of evaporated CdTe films compared with single crystal CdTe. Annual report, 1 February 1983-31 January 1984

    Energy Technology Data Exchange (ETDEWEB)

    Bube, R; Fahrenbruch, A; Huber, W; Fortmann, C; Thorpe, T

    1984-09-01

    Variation of CdS/CdTe/graphite thick film solar cell properties was investigated as a function of temperature for CdS film deposition. A maximum open-circuit voltage of 0.67 V was found for a deposition temperature of 160/sup 0/C, corresponding to a CdS film resistivity of 150 ohm-cm. The effect is not due to avoidance of higher temperature annealing of the CdTe film in higher temperature CdS film depositions nor to the diffusion of In from the outermost CdS: In layer. The effect of coating the graphite before CdTe deposition with Au or Cu was also investigated. Although high concentrations of both Au or Cu could be determined after CdTe deposition, CdTe films grown on this coated graphite had lower hole densities than films grown on uncoated graphite. Photovoltaic parameters of thin-film CdS/CdTe/graphite solar cells were investigated as a function of storage time to check the stability of these cells. Initial degradation of parameters (especially fill factor) could be reversed by heat treatment in hydrogen, with subsequent properties being stable. Heat treatment of CdS/CdTe/graphite solar cells in air increases cell resistivity and decreases fill factor; heat treatment in hydrogen produces the reverse effect. The hole density is not affected by these heat treatments, suggesting that effects are associated with grain boundaries in the film.

  14. A steady blue-emitting CdS nanocrystals-polystyrene composites

    Energy Technology Data Exchange (ETDEWEB)

    Xue, H.T. [Nanjing University of Posts and Telecommunications, Department of Applied Physics, Nanjing (China); Zhao, P.Q. [Nanjing University of Technology, Department of Applied Physics, Nanjing (China); Nanjing University, Department of Physics, Nanjing (China)

    2013-02-15

    CdS nanocrystals with narrow size distribution were synthesized in an organic solution and transparent CdS nanocrystals/polystyrene composite films were fabricated. Transmission electron microscopy, energy dispersive X-ray spectroscopy, photoluminescence and Raman spectra were adopted to investigate these samples. The result of photoluminescence measurement shows that the composite films exhibit distinct luminescence properties of more stable emission and a narrower full-width at half-maximum than that of CdS nanocrystals in solution. Detailed analysis of the Raman spectra has enabled us to identify the origin of the optimized optoelectronic properties of the CdS nanocrystals-polystyrene composites films. (orig.)

  15. Solvothermal growth of single-crystal CdS nanowires

    Indian Academy of Sciences (India)

    M A Mahdi; J J Hassan; S J Kasim; S S Ng; Z Hassan

    2014-04-01

    Cadmium sulfide (CdS) nanowires (NWs) were prepared by the solvothermal method using ethylenedi-amine as a solvent. Two sets of CdS NWs were synthesized at 160 and 200° C for various reaction durations (3.5, 7 and 24 h). Scanning/tunneling electron microscopy was used to examine the surface morphology of the grown NWs. Their dimensions are found to depend on the reaction temperature and duration. The CdS NWs grown at 200° C for all durations are longer than those prepared at 160° C, with diameters ranging from 15 to 40 nm. A three-armed structure is exhibited by all the samples. The grown CdS NWs display a hexagonal wurtzite phase and grows along the 001 direction. The optical absorption of the grown NWs shows a sharp absorption edge with a blueshift, which indicates an expansion of the optical band gap. All prepared samples show two emission peaks in their photoluminescence spectra. The emission peak location depends on the reaction temperature and duration. The CdS NWs prepared at 160° C show a sharp band–band emission compared with those prepared at 200° C. Raman analysis indicates that the optical properties of the grown NWs are enhanced with increased temperature and reaction duration.

  16. Preparation of Cd(Zn)Te and CuInSe sub 2 films and devices by a two-stage process

    Energy Technology Data Exchange (ETDEWEB)

    Basol, B.M.; Kapur, V.K. (International Solar Electric Technology (ISET), Inglewood, CA (USA))

    1991-05-01

    The two-stage process was used to prepare thin films of Cd(Zn)Te and CuInSe{sub 2}. The technique involves first depositing the elemental components of the compound onto a substrate in the form of thin stacked layers and then reacting these elemental components to obtain a thin film of the desired compound. While CdTe films grown on thin CdS layers have uniform stoichiometries and sharp interfaces with the underlying CdS layers, CdZnTe films deposited onto similar substrates give rise to diffused CdZnTe-CdS interfaces because of the reactive nature of zinc. In CuInSe{sub 2} processing, the nature of the reacted compound film strongly depends on the nature of the Cu-In layers. CdS/CuInSe{sub 2} device efficiencies are also influenced by the method of deposition for the CdS window layers. (orig.).

  17. Nanostructured and amorphous-like tungsten films grown by pulsed laser deposition

    Science.gov (United States)

    Dellasega, D.; Merlo, G.; Conti, C.; Bottani, C. E.; Passoni, M.

    2012-10-01

    An experimental investigation of nanostructured, micrometer-thick, tungsten films deposited by pulsed laser deposition is presented. The films are compact and pore-free, with crystal grain sizes ranging from 14 nm to less than 2 nm. It is shown how, by properly tailoring deposition rate and kinetic energy of ablated species, it is possible to achieve a detailed and separate control of both film morphology and structure. The role of the main process parameters, He background pressure, laser fluence, and energy, is elucidated. In contrast with W films produced with other PVD techniques, β-phase growth is avoided and the presence of impurities and contaminants, like oxygen, is not correlated with film structure. These features make these films interesting for the development of coatings with improved properties, like increased corrosion resistance and enhanced diffusion barriers.

  18. High Resistive ZnO/Diamond/Si Films Grown via Metal-organic Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YANG Hong-jun; ZHAO Bai-jun; FANG Xiu-jun; DU Guo-tong; LIU Da-li; GAO Chun-xiao; LIU Xi-zhe

    2005-01-01

    Piezoelectric ZnO layers with high resistivity for surface acoustic wave applications were prepared on polycrystalline diamond/Si substrates with (111) orientation via metal-organic chemical vapour deposition.The characteristics of the films were optimized through different growth methods. The comparative study of the X-ray diffraction spectra and scanning electron microscopic images showed that the final-prepared ZnO films were dominantly c-axis oriented. Zn and O elements in the final prepared ZnO films were investigated through X-ray photoelectron spectroscopy. According to the statistical results, the n(Zn)/n(O) ratio is near 1. The Raman scattering was also performed in back scattering configuration. E2 mode was observed for the final films, which indicated that the better quality ZnO films had been obtained. The resistivity of the films was also enhanced via the modification of the growth methods.

  19. Preferential orientation of ferroelectric calcium modified lead titanate thin films grown on various substrates

    OpenAIRE

    Ricote, J.; Calzada, M L; Mendiola, J; Chateigner, D.

    2002-01-01

    [EN] Among all the factors that determine the development of preferential orientation or texture in polycrystalline thin films, the most important is the nature of the substrate. A preferential orientation of the crystallites with the polar axis perpendicular to the film surface results in an important improvement of the ferroelectric behaviour. In the search for the substrate that produces highly oriented ferroelectric thin films, this work analyses by quantitative texture analysis ...

  20. Fractal features of CdTe thin films grown by RF magnetron sputtering

    Science.gov (United States)

    Hosseinpanahi, Fayegh; Raoufi, Davood; Ranjbarghanei, Khadijeh; Karimi, Bayan; Babaei, Reza; Hasani, Ebrahim

    2015-12-01

    Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30 W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases.

  1. Characterization of ZnO:Si nanocomposite films grown by thermal evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Siddiqui, Shabnam; Kant, Chhaya Ravi [Department of Applied Sciences, Indira Gandhi Institute of Technology, Guru Gobind Singh Indraprastha University, Delhi 110 006 (India); Arun, P. [Department of Physics and Electronics, S.G.T.B. Khalsa College, University of Delhi, Delhi-110 007 (India)], E-mail: arunp92@physics.du.ac.in; Mehra, N.C. [University Science Instrumentation Centre, University of Delhi, Delhi 110 007 (India)

    2008-11-24

    Composite films were fabricated by co-evaporating Zinc Oxide with Silicon at room temperatures. The resulting films had polycrystalline grains of Zinc Oxide whose grain size were few hundred nanometers, embedded in the silicon matrix. These nanocrystalline grains of ZnO showed good photoluminescence emission at 520 nm along with a photoluminescence emission at 620 nm being contributed by the silicon background. Thus, the nanocomposite films gave a board emission, making it a potentially useful candidate for optoelectronic devices. The photo-luminescent property of the films was found to be stable since the homgenously dispersed ZnO nanocrystals were not allowed to agglomerate by the silicon background.

  2. Structural and electronic properties of polar MnO ultrathin film grown on Ag(111)

    Science.gov (United States)

    Kundu, Asish K.; Menon, Krishnakumar S. R.

    2016-05-01

    Surface electronic structure of ultrathin polar MnO film was studied by Low-energy Electron Diffraction (LEED) and Photoemission Spectroscopic (PES) techniques. Epitaxial monolayer to facet formation with increasing film thickness has been observed by LEED. Our LEED result shows p(2x2) surface reconstruction along with facet formation, stabilize the polar MnO(111) surface. The core levels and the valence band electronic structure of MnO films have been studied as a function of film thickness using X-ray and ultraviolet photoelectron spectroscopy techniques.

  3. Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition

    Science.gov (United States)

    Linzen, S.; Ziegler, M.; Astafiev, O. V.; Schmelz, M.; Hübner, U.; Diegel, M.; Il'ichev, E.; Meyer, H.-G.

    2017-03-01

    We studied and optimised the properties of ultrathin superconducting niobium nitride films fabricated with a plasma-enhanced atomic layer deposition (PEALD) process. By adjusting process parameters, the chemical embedding of undesired oxygen into the films was minimised and a film structure consisting of mainly polycrystalline niobium nitride with a small fraction of amorphous niobium oxide and niobium oxo-nitrides were formed. For this composition a critical temperature of 13.8 K and critical current densities of 7 × 106 A cm-2 at 4.2 K were measured on 40 nm thick films. A fundamental correlation between these superconducting properties and the crystal lattice size of the cubic δ-niobium-nitride grains were found. Moreover, the film thickness variation between 40 and 2 nm exhibits a pronounced change of the electrical conductivity at room temperature and reveals a superconductor-insulator-transition in the vicinity of 3 nm film thickness at low temperatures. The thicker films with resistances up to 5 kΩ per square in the normal state turn to the superconducting one at low temperatures. The perfect thickness control and film homogeneity of the PEALD growth make such films extremely promising candidates for developing novel devices on the coherent quantum phase slip effect.

  4. Upper critical field of as-grown MgB{sub 2} thin films by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Harada, Y. [Department of Material Science and Engineering, Iwate University, Iwate Industrial Promotion Center, Iioka shinden 3-35-2, Morioka 020-0852 (Japan)]. E-mail: yharada@luck.ocn.ne.jp; Udsuka, M. [Graduate School of Engineering, Iwate University, Ueda 4-3-5, Morioka 020-8551 (Japan); Takahashi, T. [Graduate School of Engineering, Iwate University, Ueda 4-3-5, Morioka 020-8551 (Japan); Nakanishi, Y. [Graduate School of Engineering, Iwate University, Ueda 4-3-5, Morioka 020-8551 (Japan); Yoshizawa, M. [Graduate School of Engineering, Iwate University, Ueda 4-3-5, Morioka 020-8551 (Japan)

    2005-04-30

    Superconducting thin films of magnesium diboride (MgB{sub 2}) were prepared on MgO(001) substrate by molecular beam epitaxy in the co-evaporation conditions of low deposition rate and ultra-high vacuum. A superconducting transition with the onset temperature of 31.2K was confirmed by both transport and magnetization measurements. The upper critical fields are obtained from measurement of the field dependence of the resistivity. It was estimated that the upper critical field at 0K was more than 15T. The upper critical field anisotropy ratio, H{sub C2,ab}(0)/H{sub C2,c}(0), was estimated to be 1.78 from the magnetic field-temperature phase diagram for as-grown MgB{sub 2} thin films.

  5. Nucleation and Growth of MOCVD Grown (Cr, Zn)O Films – Uniform Doping vs. Secondary Phase Formation

    Energy Technology Data Exchange (ETDEWEB)

    Saraf, Laxmikant V.; Engelhard, Mark H.; Nachimuthu, Ponnusamy; Shutthanandan, V.; Wang, Chong M.; Heald, Steve M.; McCready, David E.; Lea, Alan S.; Baer, Donald R.; Chambers, Scott A.

    2007-01-17

    We report a detailed study of chromium solubility and secondary phase formation in MOCVD grown (Cr, Zn)O-based films on silicon (100). Simultaneous deposition of 0.15M Cr(TMHD) and 0.025M Zn(TMHD) based precursors in an oxidizing environment with a flow ratio of 1:10 resulted in secondary phase formation rather than uniform Cr doping. Based on several surface and micro-structural techniques, we have identified nano-crystalline ZnCr2O4 and disordered Cr2O3 as the secondary Cr-containing phases that nucleate. Analysis suggests that ZnCr2O4 crystallites are dispersed throughout the film and that disordered Cr2O3 layer may form at the interface. These results reveal a strong tendency for Cr to exist in octahedral, rather than tetrahedral coordination.

  6. Magnetic anisotropy of crystalline Fe films grown on (001 GaAs substrates using Ge buffer layers

    Directory of Open Access Journals (Sweden)

    Seul-Ki Bac

    2016-05-01

    Full Text Available Magnetic anisotropy of Fe films grown on (001 GaAs substrates using Ge buffer layers were investigated by planar Hall effect measurements. In addition to phenomena arising from dominant cubic symmetry of the Fe specimen, the study of angular dependence of magnetization reversal revealed breaking of this symmetry in the form of systematic asymmetric shifts of magnetic hysteresis loops around the crystallographic directions. We ascribe such symmetry breaking to an admixture of uniaxial anisotropy associated with the [100] direction in the Fe film. To determine the parameters associated with this uniaxial anisotropy, we quantitatively analyze the asymmetric shifts of the hysteresis loop centers from the directions. Even though the value of these parameters turns out to be relatively small compared to that of the cubic anisotropy (by about two orders of magnitude, they survive up to room temperature.

  7. Magnetic anisotropy of crystalline Fe films grown on (001) GaAs substrates using Ge buffer layers

    Science.gov (United States)

    Bac, Seul-Ki; Lee, Hakjoon; Lee, Sangyeop; Choi, Seonghoon; Yoo, Taehee; Lee, Sanghoon; Liu, X.; Furdyna, J. K.

    2016-05-01

    Magnetic anisotropy of Fe films grown on (001) GaAs substrates using Ge buffer layers were investigated by planar Hall effect measurements. In addition to phenomena arising from dominant cubic symmetry of the Fe specimen, the study of angular dependence of magnetization reversal revealed breaking of this symmetry in the form of systematic asymmetric shifts of magnetic hysteresis loops around the crystallographic directions. We ascribe such symmetry breaking to an admixture of uniaxial anisotropy associated with the [100] direction in the Fe film. To determine the parameters associated with this uniaxial anisotropy, we quantitatively analyze the asymmetric shifts of the hysteresis loop centers from the directions. Even though the value of these parameters turns out to be relatively small compared to that of the cubic anisotropy (by about two orders of magnitude), they survive up to room temperature.

  8. Compositional dependence of Raman scattering and photoluminescence emission in Cu-Ga-Se films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Grossberg, M., E-mail: mgross@staff.ttu.e [Tallinn University of Technology, Ehitajate tee 5, 19086 Tallinn (Estonia); Krustok, J. [Tallinn University of Technology, Ehitajate tee 5, 19086 Tallinn (Estonia); Siebentritt, S. [Universite du Luxembourg, 162a avenue de la Faiencerie, L-1511 Luxembourg (Luxembourg); Albert, J. [Helmholtz Centre Berlin, Glienicker Strasse 100, 14109 Berlin (Germany)

    2009-07-01

    This paper presents Raman scattering and photoluminescence (PL) analysis of polycrystalline Cu-Ga-Se films grown epitaxially on the GaAs substrate. In the compositional dependence of the Raman spectra of the CuGaSe{sub 2} films, the appearance of the ordered vacancy compounds (OVCs) CuGa{sub 3}Se{sub 5} and CuGa{sub 5}Se{sub 8} was observed. The dominating A{sub 1} Raman modes were detected at 185, 166 and 159 cm{sup -1}, respectively. The PL bands of CuGaSe{sub 2}, CuGa{sub 3}Se{sub 5} and CuGa{sub 5}Se{sub 8} at T=10 K were detected at 1.615, 1.72 and 1.76 eV, respectively. The dominating PL emission channel is the band-to-tail (BT) type recombination.

  9. Crystallographic and electronic contribution to the apparent step height in nanometer-thin Pb(111) films grown on Cu(111)

    Energy Technology Data Exchange (ETDEWEB)

    Calleja, Fabian; Parga, Amadeo L Vazquez de; Anglada, Eduardo; Hinarejos, Juan Jose; Miranda, Rodolfo; Yndurain, Felix [Departamento de Fisica de la Materia Condensada, Universidad Autonoma de Madrid, Cantoblanco 28049, Madrid (Spain)], E-mail: al.vazquezdeparga@uam.es

    2009-12-15

    Thermal roughening of Pb(111) films grown on Cu(111) produces three-dimensional (3D) islands of different number of layers allowing the simultaneous and direct measurement by scanning tunneling microscopy (STM) of the step height for different thicknesses in real space. The apparent step heights separating adjacent layers show several oscillations with amplitudes of up to 0.8-1.4 A around the bulk interlayer distance as a function of film thickness. The oscillations have bilayer periodicity with a superimposed longer beating period that produces a phase slip every eight layers. Based on first-principles calculations of Pb(111) free standing slabs, we can identify the relevant electronic states responsible for these quantum size effects. In addition, we can distinguish between geometric and electronic contributions to the apparent step heights measured on the STM images.

  10. Effect of deposition conditions on the growth rate and electrical properties of ZnO thin films grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Roro, K.T.; Botha, J.R.; Leitch, A.W.R. [Department of Physics, Nelson Mandela Metropolitan University, P.O. Box 77000, Port Elizabeth 6031 (South Africa)

    2008-07-01

    ZnO thin films have been grown on glass substrates by MOCVD. The effect of deposition conditions such as VI/II molar ratio, DEZn flow rate and total reactor pressure on the growth rate and electrical properties of the films was studied. It is found that the growth rate decreases with an increase in the VI/II molar ratio. This behaviour is ascribed to the competitive adsorption of reactant species on the growth surface. The growth rate increases with an increase in DEZn flow rate, as expected. It is shown that the carrier concentration is independent of the DEZn flow rate. An increase in the total reactor pressure yields a decrease in growth rate. This phenomenon is attributed to the depletion of the gas phase due to parasitic prereactions between zinc and oxygen species at high pressure. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  11. Impact of low temperature annealing on structural, optical, electrical and morphological properties of ZnO thin films grown by RF sputtering for photovoltaic applications

    Science.gov (United States)

    Purohit, Anuradha; Chander, S.; Sharma, Anshu; Nehra, S. P.; Dhaka, M. S.

    2015-11-01

    This paper presents effect of low temperature annealing on the physical properties of ZnO thin films for photovoltaic applications. The thin films of thickness 50 nm were grown on glass and indium tin oxide (ITO) coated glass substrates employing radio frequency magnetron sputtering technique followed by thermal annealing within low temperature range 150-450 °C. These as-grown and annealed films were subjected to the X-ray diffraction (XRD), UV-Vis spectrophotometer, source meter and scanning electron microscopy (SEM) for structural, optical, electrical and surface morphological analysis respectively. The compositional analysis of the as-grown ZnO film was also carried out using energy dispersive spectroscopy (EDS). The XRD patterns reveal that the films have wurtzite structure of hexagonal phase with preferred orientation (1 0 0) and polycrystalline in nature. The crystallographic and optical parameters are calculated and discussed in detail. The optical band gap was found in the range 3.30-3.52 eV and observed to decrease with annealing temperature except 150 °C. The current-voltage characteristics show that the films exhibit approximately ohmic behavior. The SEM studies show that the films are uniform, homogeneous and free from crystal defects and voids. The experimental results reveal that ZnO thin films may be used as alternative materials for eco-friendly buffer layer to the thin film solar cell applications.

  12. Thin films of copper oxide and copper grown by atomic layer deposition for applications in metallization systems of microelectronic devices

    Energy Technology Data Exchange (ETDEWEB)

    Waechtler, Thomas

    2010-05-25

    Copper-based multi-level metallization systems in today's ultralarge-scale integrated electronic circuits require the fabrication of diffusion barriers and conductive seed layers for the electrochemical metal deposition. Such films of only several nanometers in thickness have to be deposited void-free and conformal in patterned dielectrics. The envisaged further reduction of the geometric dimensions of the interconnect system calls for coating techniques that circumvent the drawbacks of the well-established physical vapor deposition. The atomic layer deposition method (ALD) allows depositing films on the nanometer scale conformally both on three-dimensional objects as well as on large-area substrates. The present work therefore is concerned with the development of an ALD process to grow copper oxide films based on the metal-organic precursor bis(trin- butylphosphane)copper(I)acetylacetonate [({sup n}Bu{sub 3}P){sub 2}Cu(acac)]. This liquid, non-fluorinated {beta}-diketonate is brought to react with a mixture of water vapor and oxygen at temperatures from 100 to 160 C. Typical ALD-like growth behavior arises between 100 and 130 C, depending on the respective substrate used. On tantalum nitride and silicon dioxide substrates, smooth films and selfsaturating film growth, typical for ALD, are obtained. On ruthenium substrates, positive deposition results are obtained as well. However, a considerable intermixing of the ALD copper oxide with the underlying films takes place. Tantalum substrates lead to a fast self-decomposition of the copper precursor. As a consequence, isolated nuclei or larger particles are always obtained together with continuous films. The copper oxide films grown by ALD can be reduced to copper by vapor-phase processes. If formic acid is used as the reducing agent, these processes can already be carried out at similar temperatures as the ALD, so that agglomeration of the films is largely avoided. Also for an integration with subsequent

  13. Origin of graphitic filaments on improving the electron field emission properties of negative bias-enhanced grown ultrananocrystalline diamond films in CH4/Ar plasma

    Science.gov (United States)

    Sankaran, K. J.; Huang, B. R.; Saravanan, A.; Tai, N. H.; Lin, I. N.

    2014-10-01

    Microstructural evolution of bias-enhanced grown (BEG) ultrananocrystalline diamond (UNCD) films has been investigated using microwave plasma enhanced chemical vapor deposition in gas mixtures of CH4 and Ar under different negative bias voltages ranging from -50 to -200 V. Scanning electron microscopy and Raman spectroscopy were used to characterize the morphology, growth rate, and chemical bonding of the synthesized films. Transmission electron microscopic investigation reveals that the application of bias voltage induced the formation of the nanographitic filaments in the grain boundaries of the films, in addition to the reduction of the size of diamond grains to ultra-nanosized granular structured grains. For BEG-UNCD films under -200 V, the electron field emission (EFE) process can be turned on at a field as small as 4.08 V/μm, attaining a EFE current density as large as 3.19 mA/cm2 at an applied field of 8.64 V/μm. But the films grown without bias (0 V) have mostly amorphous carbon phases in the grain boundaries, possessing poorer EFE than those of the films grown using bias. Consequently, the induction of nanographitic filaments in grain boundaries of UNCD films grown in CH4/Ar plasma due to large applied bias voltage of -200 V is the prime factor, which possibly forms interconnected paths for facilitating the transport of electrons that markedly enhance the EFE properties.

  14. Depth dependent properties of ITO thin films grown by pulsed DC sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sytchkova, A., E-mail: anna.sytchkova@enea.it [ENEA Optical Coatings Laboratory, via Anguillarese 301, 00123 Rome (Italy); Zola, D. [ENEA Optical Coatings Laboratory, via Anguillarese 301, 00123 Rome (Italy); Bailey, L.R.; Mackenzie, B.; Proudfoot, G. [Oxford Instruments Plasma Technology, Yatton, Bristol, BS49 4AP (United Kingdom); Tian, M. [NT-MDT Europe BV, High Tech Campus 83, 5656 AG Eindhoven (Netherlands); Ulyashin, A. [SINTEF Materials and Chemistry, Forskningsveien 1, P.O. 124 Blindern, NO-0314 Oslo (Norway)

    2013-05-15

    A systematically prepared set of ITO layers for solar cell applications has been analyzed by spectroscopic variable angle ellipsometry in order to trace the dependence of free carriers’ distribution along the film depth as a function of film thickness as well as its change upon annealing. Samples were deposited on silicon substrates with various thicknesses in steps of approximately 10–20 nm. This set was duplicated and these samples were annealed, so that for each thickness an as-deposited and an annealed sample is available. Conventionally measured electrical conductivity and morphological properties (AFM measurements) of the films have been compared with the optical constants’ inhomogeneity, i.e. material properties along the film thickness modelled by variable-angle spectroscopic ellipsometry. The obtained results show that the optical as well as electrical properties of thin ITO films prepared by pulsed DC sputtering are depth dependent. For the deposition conditions used a well-determined reproducible non-uniform distribution of free carriers within the film thickness was determined. In particular it has been found that the majority of free carriers in as-deposited ultra-thin ITO films is concentrated at sample half-depth, while their distribution becomes asymmetric for the thicker films, with a maximum located at approximately 40 nm depth. The distribution of free carriers in annealed samples is qualitatively different from that of as-deposited layers.

  15. Raman scattering of polycrystalline GaSb thin films grown by the co-evaporation process

    Institute of Scientific and Technical Information of China (English)

    Qiao Zai-Xiang; Sun Yun; He Wei-Yu; Liu Wei; He Qing; Li Chang-Jian

    2009-01-01

    This paper reports that GaSb thin films have been co-deposited on soda-lime glass substrates. The GaSb thin film structural properties are characterized by Raman spectroscopy. The Sb-A1g/GaSb-TO ratio decreases rapidly with the increase of substrate temperature, which suggests a small amount of crystalline Sb in the GaSb thin film and suggests that Sb atoms in the thin film decrease. In Raman spectra, the transverse optical (TO) mode intensity is stronger than that of the longitudinal optical (LO) mode, which indicates that all the samples arc disordered. The LO/TO intensity ratio increases with increasing substrate temperature which suggests the improved polycrystalline quality of the GaSb thin film. A downshift of the TO and LO frequencies of the polycrystalline GaSb thin film to single crystalline bulk GaSb Raman spectra is also observed. The uniaxial stress in GaSb thin film is calculated and the value is around 1.0 Gpa. The uniaxial stress decreases with increasing substrate temperature. These results suggest that a higher substrate temperature is beneficial in relaxing the stress in GaSb thin film.

  16. Investigation of nanostructured transparent conductive films grown by rotational-sequential-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lu, Jong-Hong, E-mail: jonghonglu@mail.mcut.edu.tw; Chen, Bo-Ying; Wang, Chih-Hsuan [Department of Materials Engineering, Ming Chi University of Technology, 84 Gungjuan Rd., Taishan Dist. New Taipei City 24301, Taiwan and Center for Thin Film Technologies and Applications, Ming Chi University of Technology, 84 Gungjuan Rd., Taishan Dist. New Taipei City 24301, Taiwan (China)

    2014-03-15

    This study fabricates three types of nanostructured conductive transparent films using a rotational-sequential-sputtering method. These films include (1) TiO{sub 2}/indium-tin oxide (ITO) and SiO{sub x}/ITO nanomultilayer films, the optical refractive indices of which can be manipulated in the range of 2.42–1.63 at a wavelength of 550 nm with a controlled resistivity range of 1 × 10{sup −3} to 2 × 10{sup −4} Ω·cm. (2) Multilayer ITO films are deposited on polyethylene terephthalate substrates, providing good flexibility and resistivity as low as 5 × 10{sup −4} Ω·cm. Finally, (3) ultrathin ITO films ranging from subnanometer to a few nanometers in thickness enable exploration of ITO film growth and thermal stability. X-ray reflection characterization provides a rapid, non-destructive method to measure the single-layer thicknesses of the nanomultilayer films and ultrathin ITO films at subnanoscale resolution.

  17. Optical parameters of Al-doped ZnO nanorod array thin films grown via the hydrothermal method.

    Science.gov (United States)

    Kim, Soaram; Kim, Min Su; Nam, Giwoong; Park, Hyunggil; Yoon, Hyunsik; Leem, Jae-Young

    2013-09-01

    ZnO seed layers were deposited onto a quartz substrate using the sol--gel method, and Al-doped ZnO (AZO) nanorod array thin films with different Al concentrations that ranged from 0 to 2.0 at. % were grown on the ZnO seed layers via the hydrothermal method. Optical parameters, including the optical band gap, the absorption coefficient, the Urbach energy, the refractive index, the dispersion parameter, and the optical conductivity, were studied to investigate the effects of Al doping on the optical properties of AZO nanorod array thin films. The optical band gaps of the ZnO and AZO nanorod array thin films were 3.206 at 0 at.%, 3.214 at 0.5 at.%, 3.226 at 1.5 at.%, and 3.268 at 2.0 at.%. The Urbach energy gradually decreased from 126 meV (0 at.%) to 70 meV (2.0 at.%) as the Al concentration was increased. The dispersion energy, the single-oscillator energy, the average oscillator wavelength, the average oscillator strength, the refractive index, and the optical conductivity of the AZO nanorod array thin films were all affected by Al doping.

  18. Surfactant controlled switching of water-in-oil wetting behaviour of porous silica films grown at oil-water interfaces

    Indian Academy of Sciences (India)

    Manish M Kulkarni; Rajdip Bandyopadhyaya; Ashutosh Sharma

    2008-11-01

    Selective permeation of oil and water across a porous medium, as in oil recovery operations, depends on the preferential wetting properties of the porous medium. We show a profound influence of surfactants in wetting of porous media and thus demonstrate a new route for the control of water-in-oil wetting of porous substrates by changing the concentration of surfactants in an aqueous sub-phase below the substrate. This strategy is employed to engineer partial reversible wetting transitions on a porous silica film. The film itself is grown and stabilized on a flat, macroscopic interface between an oil phase and an aqueous sub-phase. On increasing the surfactant (CTAB) concentration in the sub-phase, contact angle of a water drop (placed on the oil side of the film) changes from 140° to 16° in 25 min by diffusion of the surfactant across the porous film. On further replacement of the sub-phase with pure water, diffusion of the surfactant from the water drop back to the sub-phase was slower, increasing the contact angle in the process from 16° to 90° in 2 h. Wettability control by a cationic surfactant (CTAB) was found to be much faster (6 deg/min) than that offered by an anionic surfactant, SDS (0.05 deg/min). Switching of the surface wettability due to the surfactant diffusion may have implications in oil-water separation, chemical bed reactors and microfluidic devices.

  19. Structure analysis of Ni thin films epitaxially grown on bcc metal underlayers formed on MgO(100 substrates

    Directory of Open Access Journals (Sweden)

    Futamoto Masaaki

    2013-01-01

    Full Text Available Ni thin films are prepared on Cr, V, and Nb underlayers with bcc structure formed on MgO(100 single-crystal substrates by molecular beam epitaxy. The growth behavior and the crystallographic properties are investigated by in-situ reflection high-energy electron diffraction and pole-figure X-ray diffraction. Cr(100 and V(100 single-crystal underlayers grow epitaxially on the substrates, whereas an Nb epitaxial_underlayer consisting of two bcc(110 variants is formed on the MgO(100 substrate. Metastable crystals nucleate on the Cr and the V underlayers, where the metastable hcp structure is stabilized through heteroepitaxial growth. With increasing the film thickness, the hcp structure starts to transform into more stable fcc structure by atomic displacement parallel to the hcp(0001 close-packed plane. The resulting films are consisting of mixtures of hcp and fcc crystals. On the other hand, only the formation of fcc crystal is recognized for the Ni film grown on Nb(110 underlayer.

  20. Epitaxial LaFeAsO{sub 1-x}F{sub x} thin films grown by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kidszun, M; Haindl, S; Reich, E; Haenisch, J; Iida, K; Schultz, L; Holzapfel, B, E-mail: M.Kidszun@ifw-dresden.d [IFW Dresden, Institute for Metallic Materials, PO Box 270116, D-01171 Dresden (Germany)

    2010-02-15

    Superconducting and epitaxially grown LaFeAsO{sub 1-x}F{sub x} thin films were successfully prepared on (001)-oriented LaAlO{sub 3} substrates using pulsed laser deposition. The prepared thin films show exclusively a single in-plane orientation with the epitaxial relation (001)[100]||(001)[100] and a full width at half-maximum value of 1{sup 0}. Furthermore, resistive measurement of the superconducting transition temperature revealed a T{sub c,90%} of 25 K with a high residual resistive ratio of 6.8. The preparation technique applied, standard thin film pulsed laser deposition at room temperature in combination with a subsequent post-annealing process, is suitable for fabrication of high quality LaFeAsO{sub 1-x}F{sub x} thin films. A high upper critical field of 76.2 T was evaluated for magnetic fields applied perpendicular to the c-axis and the anisotropy was calculated to be 3.3 assuming single band superconductivity. (rapid communication)

  1. Investigation of cracks in GaN films grown by combined hydride and metal organic vapor-phase epitaxial method

    Directory of Open Access Journals (Sweden)

    Yang Tieying

    2011-01-01

    Full Text Available Abstract Cracks appeared in GaN epitaxial layers which were grown by a novel method combining metal organic vapor-phase epitaxy (MOCVD and hydride vapor-phase epitaxy (HVPE in one chamber. The origin of cracks in a 22-μm thick GaN film was fully investigated by high-resolution X-ray diffraction (XRD, micro-Raman spectra, and scanning electron microscopy (SEM. Many cracks under the surface were first observed by SEM after etching for 10 min. By investigating the cross section of the sample with high-resolution micro-Raman spectra, the distribution of the stress along the depth was determined. From the interface of the film/substrate to the top surface of the film, several turnings were found. A large compressive stress existed at the interface. The stress went down as the detecting area was moved up from the interface to the overlayer, and it was maintained at a large value for a long depth area. Then it went down again, and it finally increased near the top surface. The cross-section of the film was observed after cleaving and etching for 2 min. It was found that the crystal quality of the healed part was nearly the same as the uncracked region. This indicated that cracking occurred in the growth, when the tensile stress accumulated and reached the critical value. Moreover, the cracks would heal because of high lateral growth rate.

  2. Study of structural and optical properties of ZnO films grown by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lemlikchi, S., E-mail: lemlikchi_safo@yahoo.fr [Advanced Technology Development Centre, Cite 20 Aout 1956 BP 17 Baba Hassen, Algiers (Algeria); Abdelli-Messaci, S.; Lafane, S.; Kerdja, T. [Advanced Technology Development Centre, Cite 20 Aout 1956 BP 17 Baba Hassen, Algiers (Algeria); Guittoum, A.; Saad, M. [Nuclear Research Centre of Algiers, 2 Bd Frantz-Fanon, Algiers (Algeria)

    2010-07-01

    Wurtzite zinc oxides films (ZnO) were deposited on silicon (0 0 1) and corning glass substrates using the pulsed laser deposition technique. The laser fluence, target-substrate distance, substrate temperature of 300 deg. C were fixed while varying oxygen pressures from 2 to 500 Pa were used. It is observed that the structural properties of ZnO films depend strongly on the oxygen pressure and the substrate nature. The film crystallinity improves with decreasing oxygen pressure. At high oxygen pressure, the films are randomly oriented, whereas, at low oxygen pressures they are well oriented along [0 0 1] axis for Si substrates and along [1 0 3] axis for glass substrates. A honeycomb structure is obtained at low oxygen pressures, whereas microcrystalline structures were obtained at high oxygen pressures. The effect of oxygen pressure on film transparency, band gap E{sub g} and Urbach energies was investigated.

  3. ECR Nb Films Grown on Amorphous and Crystalline Cu Substrates: Influence of Ion Energy

    Energy Technology Data Exchange (ETDEWEB)

    Valente, Anne-Marie [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Eremeev, Grigory V. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Spradlin, Joshua K. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Phillips, H. Lawrence [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Reece, Charles E. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Cao, C. [Illinois Inst. of Technology, Chicago, IL (United States); Proslier, Thomas [Argonne National Laboratory, Argonne, IL (United States); Tao, T. [Univ. of Illinois at Chicago, Chicago, IL (United States)

    2014-02-01

    In the pursuit of niobium (Nb) films with similar performance with the commonly used bulk Nb surfaces for Superconducting RF (SRF) applications, significant progress has been made with the development of energetic condensation deposition techniques. Using energetic condensation of ions extracted from plasma generated by Electron Cyclotron Resonance, it has been demonstrated that Nb films with good structural properties and RRR comparable to bulk values can be produced on metallic substrates. The controlled incoming ion energy enables a number of processes such as desorption of adsorbed species, enhanced mobility of surface atoms and sub-implantation of impinging ions, thus producing improved film structures at lower process temperatures. Particular attention is given to the nucleation conditions to create a favourable template for growing the final surface exposed to SRF fields. The influence of the deposition energy on film growth on copper substrates is investigated with the characterization of the film surface, structure, superconducting properties and RF performance.

  4. Electrical characterization of gadolinia doped ceria films grown by pulsed laser deposition

    DEFF Research Database (Denmark)

    Rodrigo, Katarzyna Agnieszka; Heiroth, Sebastian; Lundberg, Mats

    2010-01-01

    Electrical characterization of 10 mol% gadolinia doped ceria (CGO10) films of different thicknesses prepared on MgO(100) substrates by pulsed laser deposition is presented. Dense, polycrystalline and textured films characterized by fine grains (grain sizes ... thickness. The conductivity of the nanocrystalline films is lower (7.0×10−4 S/cm for the 20-nm film and 3.6×10−3 S/cm for the 435-nm film, both at 500°C) than that of microcrystalline, bulk samples ( S/cm at 500°C). The activation energy for the conduction is found to be 0.83 eV for the bulk material, while...

  5. Properties of CdTe nanocrystalline thin films grown on different substrates by low temperature sputtering

    Institute of Scientific and Technical Information of China (English)

    Chen Huimin; Guo Fuqiang; Zhang Baohua

    2009-01-01

    CdTe nanocrystalline thin films have been prepared on glass, Si and Al2O3 substrates by radio-frequency magnetron sputtering at liquid nitrogen temperature. The crystal structure and morphology of the films were characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM). The XRD examinations revealed that CdTe films on glass and Si had a better crystal quality and higher preferential orientation along the (111) plane than the Al2O3. FESEM observations revealed a continuous and dense morphology of CdTe films on glass and Si substrates. Optical properties of nanocrystalline CdTe films deposited on glass substrates for different deposited times were studied.

  6. Structural and morphological properties of metallic thin films grown by pulsed laser deposition for photocathode application

    Science.gov (United States)

    Lorusso, A.; Gontad, F.; Caricato, A. P.; Chiadroni, E.; Broitman, E.; Perrone, A.

    2016-03-01

    In this work yttrium and lead thin films have been deposited by pulsed laser deposition technique and characterized by ex situ different diagnostic methods. All the films were adherent to the substrates and revealed a polycrystalline structure. Y films were uniform with a very low roughness and droplet density, while Pb thin films were characterized by a grain morphology with a relatively high roughness and droplet density. Such metallic materials are studied because they are proposed as a good alternative to copper and niobium photocathodes which are generally used in radiofrequency and superconducting radiofrequency guns, respectively. The photoemission performances of the photocathodes based on Y and Pb thin films have been also studied and discussed.

  7. Literate Programming System CDS

    Institute of Scientific and Technical Information of China (English)

    曾云峰

    1991-01-01

    This paper presents a broad outline and some implementation techniques of the literate programming system CDS.Compared with the previous ones (e.g.WEB,Cweb),CDS has two main characteristics:1) A Chinese-English typesetting system was developed to produce the documentation.This makes the Chinese documentation possible.2) A suitable method for automatic formatting was introduced to generate the software documentation automatically.This frees the programmer from typesetting details while still allowing programmer's interference.

  8. Characterization of ZnO thin films grown on different p-Si substrate elaborated by solgel spin-coating method

    Energy Technology Data Exchange (ETDEWEB)

    Chebil, W., E-mail: Chbil.widad@live.fr [Laboratoire Physico-chimie des Matériaux, Unité de Service Commun de Recherche “High resolution X-ray diffractometer”, Département de Physique, Université de Monastir, Faculté des Sciences de Monastir, Avenue de l’Environnement, 5019 Monastir (Tunisia); Fouzri, A. [Laboratoire Physico-chimie des Matériaux, Unité de Service Commun de Recherche “High resolution X-ray diffractometer”, Département de Physique, Université de Monastir, Faculté des Sciences de Monastir, Avenue de l’Environnement, 5019 Monastir (Tunisia); Institut Supérieur des Sciences Appliquées et de Technologie de Sousse, Université de Sousse (Tunisia); Fargi, A. [Laboratoire de Microélectronique et Instrumentation, Faculté des Sciences de Monastir, Université de Monastir, Avenue de l’environnement, 5019 Monastir (Tunisia); Azeza, B.; Zaaboub, Z. [Laboratoire Micro-Optoélectroniques et Nanostructures, Faculté des Sciences de Monastir, Université de Monastir, Avenue de l' environnement, 5019 Monastir (Tunisia); and others

    2015-10-15

    Highlights: • High quality ZnO thin films grown on different p-Si substrates were successful obtained by sol–gel process. • PL measurement revealed that ZnO thin film grown on porous Si has the better optical quality. • I–V characteristics for all heterojunctions exhibit successful diode formation. • The diode ZnO/PSi shows a better photovoltaic effect under illumination with a maximum {sub Voc} of 0.2 V. - Abstract: In this study, ZnO thin films are deposited by sol–gel technique on p-type crystalline silicon (Si) with [100] orientation, etched silicon and porous silicon. The structural analyses showed that the obtained thin films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented along the c-axis direction. Morphological study revealed the presence of rounded and facetted grains irregularly distributed on the surface of all samples. PL spectra at room temperature revealed that ZnO thin film grown on porous Si has a strong UV emission with low defects in the visible region comparing with ZnO grown on plat Si and etched Si surface. The heterojunction parameters were evaluated from the (I–V) under dark and illumination at room temperature. The ideality factor, barrier height and series resistance of heterojunction grown on different p-Si substrates are determined by using different methods. Best electrical properties are obtained for ZnO layer deposited on porous silicon.

  9. Random lasing of ZnO thin films grown by pulsed-laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cachoncinlle, C., E-mail: christophe.cachoncinlle@univ-orleans.fr [GREMI, UMR 7344 CNRS—Université Orléans, 45067 Orléans Cedex 2 (France); Hebert, C.; Perrière, J. [Sorbonne Universités, UPMC Université Paris 06, UMR 7588, INSP, 75005 Paris (France); CNRS, UMR 7588, INSP, 75005 Paris (France); Nistor, M. [NILPRP, L 22 PO Box. MG-36, 77125 Bucharest—Magurele (Romania); Petit, A.; Millon, E. [GREMI, UMR 7344 CNRS—Université Orléans, 45067 Orléans Cedex 2 (France)

    2015-05-01

    Highlights: • Random lasing at RT in nanocrystalline ZnO PLD thin film (<100 nm). • Low optical pumping threshold (<30 kW cm{sup −2}) for UV random lasing. • Random lasing interpreted by the electron-hole plasma (EHP) model. - Abstract: Low-dimensional semiconductor structures on nanometer scale are of great interest because of their strong potential applications in nanotechnologies. We report here optical and structural properties on UV lasing in ZnO thin films. The ZnO films, 110 nm thick, were prepared using pulsed-laser deposition on c-cut sapphire substrates at 500 °C under 10{sup −2} oxygen pressure. The ZnO films are nearly stoichiometric, dense and display the wurtzite phase. The films are highly textured along the ZnO c-axis and are constituted of nanocrystallites. According to Hall measurements these films are conductive (0.11 Ω cm). Photoluminescence measurements reveals a so-called random lasing in the range 390 to 410 nm, when illuminating at 355 nm with a tripled frequency pulsed Nd-YAG laser. Such random lasing is obtained at rather low optical pumping, 45 kW cm{sup −2}, a value lower than those classically reported for pulsed-laser deposition thin films.

  10. Nanostructured silicon carbon thin films grown by plasma enhanced chemical vapour deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Coscia, U. [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); CNISM Unita' di Napoli, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Ambrosone, G., E-mail: ambrosone@na.infn.it [Dipartimento di Fisica, Università di Napoli “Federico II” Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); SPIN-CNR, Complesso Universitario MSA, via Cinthia, 80126 Napoli (Italy); Basa, D.K. [Department of Physics, Utkal University, Bhubaneswar 751004 (India); Rigato, V. [INFN Laboratori Nazionali Legnaro, 35020 Legnaro (Padova) (Italy); Ferrero, S.; Virga, A. [Dipartimento di Scienza Applicata e Tecnologia, Politecnico di Torino, C.so Duca degli Abruzzi 24, 10129 Torino (Italy)

    2013-09-30

    Nanostructured silicon carbon thin films, composed of Si nanocrystallites embedded in hydrogenated amorphous silicon carbon matrix, have been prepared by varying rf power in ultra high vacuum plasma enhanced chemical vapour deposition system using silane and methane gas mixtures diluted in hydrogen. In this paper we have studied the compositional, structural and electrical properties of these films as a function of rf power. It is shown that with increasing rf power the atomic densities of carbon and hydrogen increase while the atomic density of silicon decreases, resulting in a reduction in the mass density. Further, it is demonstrated that carbon is incorporated into amorphous matrix and it is mainly bonded to silicon. The study has also revealed that the crystalline volume fraction decreases with increase in rf power and that the films deposited with low rf power have a size distribution of large and small crystallites while the films deposited with relatively high power have only small crystallites. Finally, the enhanced transport properties of the nanostructured silicon carbon films, as compared to amorphous counterpart, have been attributed to the presence of Si nanocrystallites. - Highlights: • The mass density of silicon carbon films decreases from 2.3 to 2 g/cm{sup 3}. • Carbon is incorporated in the amorphous phase and it is mainly bonded to silicon. • Nanostructured silicon carbon films are deposited at rf power > 40 W. • Si nanocrystallites in amorphous silicon carbon enhance the electrical properties.

  11. Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

    2010-06-01

    Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of CC, CH, SiC, and SiH bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio ID/IG. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

  12. Properties of ZrB2 Thin Films Grown by E-Beam Evaporation

    Science.gov (United States)

    Lad, Robert; Stewart, David; Sell, Julia; Bernhardt, George; Frankel, David; University of Maine Team

    2014-03-01

    Zirconium diboride (ZrB2) is a candidate material for many high temperature applications because it has a high melting point, high hardness, thermal shock resistance, and metallic conductivity. However, very little work has been reported concerning growth of ZrB2 thin films and high temperature oxidation behavior. In this study, ZrB2 films with nominal thickness of 200 nm have been deposited using electron-beam evaporation of either ZrB2 pellets or elemental B and Zr sources. The ZrB2 source yields a film that has a 1:1 Zr:B average composition as measured by X-ray photoelectron spectroscopy, consisting of ZrB2 precipitates within an amorphous Zr matrix as determined by X-ray diffraction. Use of elemental B and Zr sources allows precise control of film growth over a range of stoichiometries and yields ZrB2 films with much lower oxygen contamination. After annealing ZrB2 films to 1200°C in air, oxidation leads to a loss of B and formation of a textured monoclinic ZrO2 phase. Several strategies, including deposition of a thin Al2O3 capping layer over the ZrB2 film are being pursued in an attempt to stabilize the electrically conductive ZrB2 phase at high temperature, where it can be used for high temperature electronic devices in harsh environments. Supported by NSF grant # 1309983.

  13. Effects of Annealing Ambient on the Characteristics of LaAlO3 Films Grown by Atomic Layer Deposition

    Science.gov (United States)

    Zhao, Lu; Liu, Hong-xia; Wang, Xing; Fei, Chen-xi; Feng, Xing-yao; Wang, Yong-te

    2017-02-01

    We investigated the effects of different annealing ambients on the physical and electrical properties of LaAlO3 films grown by atomic layer deposition. Post-grown rapid thermal annealing (RTA) was carried out at 600 °C for 1 min in vacuum, N2, and O2, respectively. It was found that the chemical bonding states at the interfacial layers (ILs) between LaAlO3 films and Si substrate were affected by the different annealing ambients. The formation of IL was enhanced during the RTA process, resulting in the decrease of accumulation capacitance, especially in O2 ambient. Furthermore, based on the capacitance-voltage characteristics of LaAlO3/Si MIS capacitors, positive V FB shifting tendency could be observed, indicating the decrease of positive oxide charges. Meanwhile, both trapped charge density and interface trap density showed decreased trends after annealing treatments. In addition, RTA process in various gaseous ambients can reduce the gate leakage current due to the enhancement of valence band offset and the reduction of defects in the LaAlO3/Si structure in varying degrees.

  14. Photoconducting ultraviolet detectors based on GaN films grown by electron cyclotron resonance molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Misra, M.; Shah, K.S. [Radiation Monitoring Devices, Inc., Watertown, MA (United States); Moustakas, T.D.; Vaudo, R.P.; Singh, R. [Boston Univ., MA (United States). Molecular Beam Epitaxy Lab.

    1995-08-01

    We report for the first time, fabrication of photoconducting UV detectors made from GaN films grown by molecular beam epitaxy. Semi-instilating GaN films were grown by the method of electron cyclotron resonance microwave plasma-assisted molecular beam epitaxy (ECR-MBE). Photoconductive devices with interdigitated electrodes were fabricated and their photoconducting properties were investigated. In this paper we report on the performance of the detectors in terms of UV responsivity, gain-quantum efficiency product, spectral response and response time. We have measured responsivity of 125A/W and gain-quantum efficiency product of 600 at 254nm and 25V. The response time was measured to be on the order of 20ns for our detectors, corresponding to a bandwidth of 25Mhz. The spectral response showed a sharp long-wavelength cutoff at 365nm, and remained constant in the 200nm to 365nm range. The response of the detectors to low-energy x-rays was measured and found to be linear for x-rays with energies ranging from 60kVp to 90kVp.

  15. Studies on Gold Doped Lead Sulphide Thin Films Grown by Silar Technique

    Science.gov (United States)

    Preetha, K. C.; Murali, K. V.; Ragina, A. J.; Deepa, K.; Remadevi, T. L.

    2011-10-01

    Narrow band gap lead chalcogenide semiconductors have been widely used in various solid state midinfrared devices, such as light emitting devices (LEDs), laser diodes (LDs), detectors, and thermoelectric generators. In this article, the subject of research is the synthesis and characterization of PbS thin films doped with gold nanoparticles and nanorods. The successive ionic layer adsorption and reaction (SILAR) technique was used to deposit PbS nanostructured films on glass substrates. The optimization of various preparative parameters resulted in mirror like smooth, uniform films with metallic appearance. Characterization of the films has been carried out using x-ray diffraction, scanning electron microscopy, optical and electrical resistivity studies. Experimental results showed that the growth parameters and doping influenced the structure, the morphology and the optical properties of PbS films. X-ray diffraction studies confirmed the cubic nanocrystalline PbS phase formation with average crystallite size in the range 16-20 nm. Doping induced increase in the grain size, which is in agreement with SEM morphology also. EDAX studies confirmed the presence of lead, sulfur along with gold crystallites in the films. All films show higher absorption in the visible-near infrared region of the spectrum. The low transmittance in the UV-VIS region offers the possibility of using the samples as solar control coatings. The films are found to be p type and the electrical conductivity decreases slightly on doping. The observed conductivity is of the order of 10-8 (Ω cm)-1. The present work established the flexibility of SILAR method to prepare good quality thin films by cost effective technique.

  16. Silicon carbide thin films as nuclear ceramics grown by laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Filipescu, M., E-mail: morarm@nipne.ro [National Institute for Laser, Plasma and Radiation Physics, P.O. Box MG 16, RO 77125, Magurele - Bucharest (Romania); Velisa, G. [Horia Hulubei National Institute of Physics and Nuclear Engineering, P.O.BOX MG-6, Bucharest - Magurele (Romania); Ion, V.; Andrei, A. [National Institute for Laser, Plasma and Radiation Physics, P.O. Box MG 16, RO 77125, Magurele - Bucharest (Romania); Scintee, N.; Ionescu, P. [Horia Hulubei National Institute of Physics and Nuclear Engineering, P.O.BOX MG-6, Bucharest - Magurele (Romania); Stanciu, S.G. [Center for Microscopy- Microanalysis and Information Processing, University ' POLITEHNICA' of Bucharest, Bucharest (Romania); Pantelica, D. [Horia Hulubei National Institute of Physics and Nuclear Engineering, P.O.BOX MG-6, Bucharest - Magurele (Romania); Dinescu, M. [National Institute for Laser, Plasma and Radiation Physics, P.O. Box MG 16, RO 77125, Magurele - Bucharest (Romania)

    2011-09-01

    Silicon carbide has been identified as a potential inert matrix candidate for advanced fuel. In this work, the growth of SiC thin films by pulsed laser deposition is reported. The stoicheometry and thickness of deposited films was investigated by non-Rutherford backscattering spectrometry. The influence of the deposition parameters, i.e. substrate temperature and laser fluence on the structure, morphology and optical properties of the deposited thin layers was studied. It was found that polycrystalline SiC thin films with uniform surface morphology were obtained at 873 K.

  17. Amorphization and recrystallization of epitaxial ReSi2 films grown on Si(100)

    Science.gov (United States)

    Kim, Kun HO; Bai, G.; Nicolet, MARC-A.; Mahan, John E.; Geib, Kent M.

    1991-01-01

    The effects of implantation damage and the chemical species of the implant on structural and electrical properties of epitaxial ReSi2 films on Si(100) implanted with Si-28 or Ar-40 ions, at doses ranging from 10 to the 13th/sq cm to 10 to the 15th/sq cm, were investigated using the backscattering spectrometry, XRD, and the van der Pauw techniques. Results showed that ion implantation produces damage in the film, which increases monotonically with dose; the resistivity of the film decreases monotonically with dose.

  18. Nitrogen doping in atomic layer deposition grown titanium dioxide films by using ammonium hydroxide

    Energy Technology Data Exchange (ETDEWEB)

    Kaeaeriaeinen, M.-L., E-mail: marja-leena.kaariainen@lut.fi; Cameron, D.C.

    2012-12-30

    Titanium dioxide films have been created by atomic layer deposition using titanium chloride as the metal source and a solution of ammonium hydroxide in water as oxidant. Ammonium hydroxide has been used as a source of nitrogen for doping and three thickness series have been deposited at 350 Degree-Sign C. A 15 nm anatase dominated film was found to possess the highest photocatalytic activity in all film series. Furthermore almost three times better photocatalytic activity was discovered in the doped series compared to undoped films. The doped films also had lower resistivity. The results from X-ray photoemission spectroscopy showed evidence for interstitial nitrogen in the titanium dioxide structure. Besides, there was a minor red shift observable in the thickest samples. In addition the film conductivity was discovered to increase with the feeding pressure of ammonium hydroxide in the oxidant precursor. This may indicate that nitrogen doping has caused the decrease in the resistivity and therefore has an impact as an enhanced photocatalytic activity. The hot probe test showed that all the anatase or anatase dominant films were p-type and all the rutile dominant films were n-type. The best photocatalytic activity was shown by anatase-dominant films containing a small amount of rutile. It may be that p-n-junctions are formed between p-type anatase and n-type rutile which cause carrier separation and slow down the recombination rate. The combination of nitrogen doping and p-n junction formation results in superior photocatalytic performance. - Highlights: Black-Right-Pointing-Pointer We found all N-doped and undoped anatase dominating films p-type. Black-Right-Pointing-Pointer We found all N-doped and undoped rutile dominating films n-type. Black-Right-Pointing-Pointer We propose that p-n junctions are formed in anatase-rutile mixture films. Black-Right-Pointing-Pointer We found that low level N-doping has increased TiO{sub 2} conductivity. Black

  19. Schottky Junction Methane Sensors Using Electrochemically Grown Nanocrystalline-Nanoporous ZnO Thin Films

    Directory of Open Access Journals (Sweden)

    P. K. Basu

    2009-01-01

    Full Text Available Nanocrystalline-nanoporous ZnO thin films were prepared by an electrochemical anodization method, and the films were tested as methane sensors. It was found that Pd-Ag catalytic contacts showed better sensing performance compared to other noble metal contacts like Pt and Rh. The methane sensing temperature could be reduced to as low as 100∘C by sensitizing nanocrystalline ZnO thin films with Pd, deposited by chemical method. The sensing mechanism has been discussed briefly.

  20. Thin-Film Solar Cells with InP Absorber Layers Directly Grown on Nonepitaxial Metal Substrates

    KAUST Repository

    Zheng, Maxwell

    2015-08-25

    The design and performance of solar cells based on InP grown by the nonepitaxial thin-film vapor-liquid-solid (TF-VLS) growth technique is investigated. The cell structure consists of a Mo back contact, p-InP absorber layer, n-TiO2 electron selective contact, and indium tin oxide transparent top electrode. An ex situ p-doping process for TF-VLS grown InP is introduced. Properties of the cells such as optoelectronic uniformity and electrical behavior of grain boundaries are examined. The power conversion efficiency of first generation cells reaches 12.1% under simulated 1 sun illumination with open-circuit voltage (VOC) of 692 mV, short-circuit current (JSC) of 26.9 mA cm-2, and fill factor (FF) of 65%. The FF of the cell is limited by the series resistances in the device, including the top contact, which can be mitigated in the future through device optimization. The highest measured VOC under 1 sun is 692 mV, which approaches the optically implied VOC of ≈795 mV extracted from the luminescence yield of p-InP. The design and performance of solar cells based on indium phosphide (InP) grown by the nonepitaxial thin-film vapor-liquid-solid growth technique is investigated. The cell structure consists of a Mo back contact, p-InP absorber layer, n-TiO2 electron selective contact, and an indium tin oxide transparent top electrode. The highest measured open circuit voltage (VOC) under 1 sun is 692 mV, which approaches the optically implied VOC of ≈795 mV extracted from the luminescence yield of p-InP.

  1. Layer-dependent supercapacitance of graphene films grown by chemical vapor deposition on nickel foam

    KAUST Repository

    Chen, Wei

    2013-03-01

    High-quality, large-area graphene films with few layers are synthesized on commercial nickel foams under optimal chemical vapor deposition conditions. The number of graphene layers is adjusted by varying the rate of the cooling process. It is found that the capacitive properties of graphene films are related to the number of graphene layers. Owing to the close attachment of graphene films on the nickel substrate and the low charge-transfer resistance, the specific capacitance of thinner graphene films is almost twice that of the thicker ones and remains stable up to 1000 cycles. These results illustrate the potential for developing high-performance graphene-based electrical energy storage devices. © 2012 Elsevier B.V. All rights reserved.

  2. Structural, optical, and electrical properties of tin sulfide thin films grown by spray pyrolysis

    Energy Technology Data Exchange (ETDEWEB)

    Calixto-Rodriguez, M. [Instituto de Ciencias Fisicas-Universidad Nacional Autonoma de Mexico, Apartado Postal 48-3, 62210, Cuernavaca, Morelos (Mexico)], E-mail: manuela@fis.unam.mx; Martinez, H. [Instituto de Ciencias Fisicas-Universidad Nacional Autonoma de Mexico, Apartado Postal 48-3, 62210, Cuernavaca, Morelos (Mexico); Sanchez-Juarez, A.; Campos-Alvarez, J. [Centro de Investigacion en Energia-Universidad Nacional Autonoma de Mexico, 62580, Temixco, Morelos (Mexico); Tiburcio-Silver, A. [Instituto Tecnologico de Toluca-SEP, Apartado Postal 20, 52176, Metepec 3, Estado de Mexico (Mexico); Calixto, M.E. [Consultant, Cuernavaca, Morelos (Mexico)

    2009-02-02

    Tin sulfide (SnS) thin films have been prepared by spray pyrolysis (SP) technique using tin chloride and N, N-dimethylthiourea as precursor compounds. Thin films prepared at different temperatures have been characterized using several techniques. X-ray diffraction studies have shown that substrate temperature (T{sub s}) affects the crystalline structure of the deposited material as well as the optoelectronic properties. The calculated optical band gap (E{sub g}) value for films deposited at T{sub s} = 320-396 deg. C was 1.70 eV (SnS). Additional phases of SnS{sub 2} at 455 deg. C and SnO{sub 2} at 488 deg. C were formed. The measured electrical resistivity value for SnS films was {approx} 1 x 10{sup 4} {omega}-cm.

  3. Characterization of (100)-orientated diamond film grown by HFCVD method with a positive DC bias voltage

    Institute of Scientific and Technical Information of China (English)

    MA Ying; WANG Lin-jun; LIU Jian-min; SU Qing-feng; XU Run; PENG Hong-yan; SHI Wei-min; XIA Yi-ben

    2006-01-01

    The (100)-orientated diamond film was deposited by hot-filament chemical vapor deposition (HFCVD) technology with a positive DC bias voltage. The morphology,X-ray diffraction (XRD),RAMAN spectrum and dark current versus applied voltage characteristics analysis show that the positive dc bias can increase the nucleation density and (100)-orientated growth,making the growth of the high quality diamond film easier and cheaper than using other methods.

  4. Continuous Ultra-Thin MOS2 Films Grown by Low-Temperature Physical Vapor Deposition (Postprint)

    Science.gov (United States)

    2014-07-01

    films are composed of nano -scale domains with strong chemical binding between domain boundaries, allowing lift-off from the substrate and electronic...process yields materials with key optical and electronic properties identical to exfoliated layers. The films are composed of nano -scale domains with...with a layered atomic structure giving rise to remarkable me- chanical (e.g., low shear strength for solid lubrication )1 and catalytic (e.g

  5. Fabrication and characterization of borocarbide thin films grown by in-situ process

    CERN Document Server

    Arisawa, S; Togano, K

    1999-01-01

    We have reported on the fabrication of thin films of YNi sub 2 B sub 2 C for the first time. The process, however, requires the post-annealing at 1050 .deg. C. It is preferable to avoid such a high temperature for practical device applications and we are aiming at establishing an in-situ process at lower temperatures. To obtain films with higher T sub c , it is very important to know the relationship between what we choose as substrates and what we get on them. Three kinds of substrates, polished MgO, unpolished MgO, and polished SrTiO sub 3 were adopted. As for former 2 kinds of substates, superconductive films were successfully fabricated with the T sub c of approx 11K. Further, we discuss the fabrication of thin films of YPd sub 2 B sub 2 C on SrTiO sub 3 substrate. We tried to synthesize the films of the Pd system by RF sputtering technique as well. So far, it is uncertain whether or not the 1221 phase exists in the films. However, the slight reduction of the resistance was observed at 23 K, which is almo...

  6. Preparation, Structural and Dielectric Properties of Solution Grown Polyvinyl Alcohol(PVA) Film

    Science.gov (United States)

    Nangia, Rakhi; Shukla, Neeraj K.; Sharma, Ambika

    2017-08-01

    Flexible dielectrics with high permittivity have been investigated extensively due to their applications in electronic industry. In this work, structural and electrical characteristics of polymer based film have been analysed. Poly vinyl alcohol (PVA) film was prepared by solution casting method. X-ray diffraction (XRD) characterization technique is used to investigate the structural properties. The semi-crystalline nature has been determined by the analysis of the obtained XRD pattern. Electrical properties of the synthesized film have been analysed from the C-V and I-V curves obtained at various frequencies and temperatures. Low conductivity values confirm the insulating behaviour of the film. However, it is found that conductivity increases with temperature. Also, the dielectric permittivity is found to be higher at lower frequencies and higher temperatures, that proves PVA to be an excellent dielectric material which can be used in interface electronics. Dielectric behaviour of the film has been explained based on dipole orientations to slow and fast varying electric field. However further engineering can be done to modulate the structural, electrical properties of the film.

  7. Atomic force microscopic characterization of films grown by inverse pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Egerhazi, L. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Geretovszky, Zs. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Csako, T. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Szoerenyi, T. [Research Group on Laser Physics of the Hungarian Academy of Sciences, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary)]. E-mail: t.szorenyi@physx.u-szeged.hu

    2006-04-30

    Carbon nitride films have been deposited by KrF excimer laser ablation of a rotating graphite target in 5 Pa nitrogen ambient in an inverse pulsed laser deposition configuration, where the backward motion of the ablated species is utilised for film growth on substrates lying in the target plane. Topometric AFM scans of the films, exhibiting elliptical thickness distribution, have been recorded along the axes of symmetry of the deposition area. High resolution AFM scans revealed the existence of disk-like, or somewhat elongated rice-like features of 5-10 nm average thickness and {approx}100 nm largest dimension, densely packed over the whole, approximately 14 x 10 cm{sup 2} deposition area. The RMS roughness of the film decreased from 9 nm near to the laser spot down to 2 nm in the outer regions. Even the highest RMS value obtained for IPLD films was less than half of the typical, 25 nm roughness measured on simultaneously deposited PLD films.

  8. Influence of Substrate-Film Reactions on YBCO Grown by Fluorine-Free MOD Route

    DEFF Research Database (Denmark)

    Zhao, Yue; Tang, Xiao; Wu, W.

    2017-01-01

    deposited by the FF-MOD route, while the BaCeO3 by-product is a dominating phase in the fully reacted film. Based on the structural analysis of the partially converted films, we found that interfacial reactions between the film and the CLO cap layer play an essential role on the epitaxial growth of YBCO......Recently, fluorine-free metal organic deposition routes (FF-MOD) for growth of YBCO superconducting films have attracted increased attentions. In this paper, a comparison study was performed on the YBCO-Ag superconducting thin films deposited on two types substrates, LaAlO3 and CSD-Ce0.9La0.1O2-y......-Ag films from the FF-MOD solution. Because of the different chemical reaction path compared to conventional TFA-MOD routes, it seems that the polycrystalline BaCeO3 formation takes place prior to the YBCO-Ag epitaxial growth associated with the melting process, which results in structural deterioration...

  9. Preparation and characterization of TiO{sub 2} thin films grown by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Selmi, M.; Chaabouni, F.; Abaab, M.; Rezig, B. [Photovoltaic and Semiconductor Materials Laboratory, Enit (Tunisia)

    2008-07-01

    Titanium dioxide (TiO{sub 2}) thin films were obtained by RF sputtering technique. The samples were deposited on glass and p- silicon substrates at an argon flow rate of 4.9 sccm and at room temperature during 4 h. In this work, the influences of RF power density and annealing temperature on properties of obtained thin films were investigated. The morphological, structural and optical properties were studied by Atomic Force Microscope (AFM), X-ray Diffractometer and UV-VIS-NIR spectrophotometer respectively. A high transmission (about 80%) in the visible region, crystalline structure and a direct band gap (between 3.4 and 3.5 eV) were ob- served by the measurements. Thin films were annealed at different temperatures (from 300 to 500 C) during 30 minutes in order to investigate the annealing effect on properties of TiO{sub 2} thin films. The refractive index and the roughness increase with increasing annealing temperature. The results of this work suggest that the properties of TiO{sub 2} thin films are sensitive to sputtering parameters. It is possible to obtain sputter-deposited TiO{sub 2} films at room temperature, without using reactive oxygen, with a good predominance of anatase (101) structure after the annealing at 400 C. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. Dislocation Reduction Mechanisms in Gallium Nitride Films Grown by Canti-Bridge Epitaxy Method

    Institute of Scientific and Technical Information of China (English)

    XING Zhi-Gang; WANG Jing; PEI Xiao-Jiang; WAN Wei; CHEN Hong; ZHOU Jun-Ming

    2007-01-01

    @@ By using the special maskless V-grooved c-plane sapphire as the substrate, we previously developed a novel GaN LEO method, or the so-called canti-bridge epitaxy (CBE), and consequently wing-tilt-free GaN films were obtained with low dislocation densities, with which all the conventional difficulties can be overcome [J. Vacuum Sci.Technol. B 23 (2005) 2476]. Here the evolution manner of dislocations in the CBE GaN films is investigated using transmission electron microscopy. The mechanisms of dislocation reduction are discussed. Dislocation behaviour is found to be similar to that in the conventional LEO GaN films except the enhanced dislocation-combination at the coalescence boundary that is a major dislocation-reduction mechanism for the bent horizontal-propagating dislocations in the CBE GaN films. The enhancement of this dislocation-combination probability is believed to result from the inclined shape and the undulate morphology of the sidewalls, which can be readily obtained in a wide range of applicable film-growth conditions during the GaN CBE process. Further development of the GaN CBE method and better crystal-quality of the GaN film both are expected.

  11. The effect of deposition parameters on the phase of TiO{sub 2} films grown by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Lim, Ji Chon; Song, Kyu Jeong [Chonbuk National University, Jeonju (Korea, Republic of); Park, Chan [Seoul National University, Seoul (Korea, Republic of)

    2014-12-15

    TiO{sub 2} thin films were deposited on Si substrates by using conventional radio-frequency (RF) magnetron sputtering with either metallic Ti or TiO{sub 2} targets, and the effect of the deposition parameters (substrate temperature (T{sub s}), RF sputtering power, gas flow ratio of O{sub 2}/(Ar+O{sub 2}) and deposition time) on the phase of the film was investigated. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to obtain information on the phase of the films and on the surface image/thickness of films, respectively. TiO{sub 2} films deposited at a T{sub s} higher than 300 .deg. C by using a metallic Ti target showed the dominant presence of the rutile phase. For films grown at a constant T{sub s} of 300 .deg. C with different gas flow ratios of O{sub 2}/(Ar+O{sub 2}), the amount of the rutile phase gradually decreased as the oxygen gas flow was decreased. The anatase phase, however, was formed when the O{sub 2}/(Ar+O{sub 2}) was 0.2. On the other hand, for TiO{sub 2} films deposited at T{sub s}'s between 50 .deg. C and 200 .deg. C with an O{sub 2}/(Ar+O{sub 2}) of 0.1 by using a TiO{sub 2} target, both the anatase and the rutile phases gradually decreased as the T{sub s} was increased. For TiO{sub 2} films deposited with various gas flow ratios of O{sub 2}/(Ar+O{sub 2}) between 0 and 0.4 at a constant T{sub s} of 200 .deg. C by using a TiO{sub 2} target, the anatase phase gradually decreased, but the rutile phase gradually increased, as the gas flow ratio was increased.

  12. Influence of Postdeposition Cooling Atmosphere on Thermoelectric Properties of 2% Al-Doped ZnO Thin Films Grown by Pulsed Laser Deposition

    Science.gov (United States)

    Saini, S.; Mele, P.; Honda, H.; Matsumoto, K.; Miyazaki, K.; Luna, L. Molina; Hopkins, P. E.

    2015-06-01

    We have investigated the thermoelectric properties of 2% Al-doped ZnO (AZO) thin films depending on the postdeposition cooling atmosphere [in oxygen pressure (AZO-O) or vacuum (AZO-V)]. Thin films were grown by pulsed laser deposition on sapphire () substrates at various deposition temperatures ( to ). All films were c-axis oriented. The electrical conductivity of AZO-V thin films was higher than that of AZO-O thin films across the whole temperature range from 300 K to 600 K, due to the optimal carrier concentration () of AZO-V samples. Furthermore, the thermoelectric performance of AZO-V films increased with the deposition temperature; for instance, the highest power factor of and dimensionless figure of merit of 0.07 at 600 K were found for AZO-V thin film deposited at.

  13. Characterization and antibacterial activity of nanocrystalline Mn doped Fe2O3 thin films grown by successive ionic layer adsorption and reaction method

    OpenAIRE

    2016-01-01

    Successive ionic layer adsorption and reaction (SILAR) method have been successfully employed to grow nanocrystalline Mn doped α-Fe2O3 thin films onto glass substrates. The structural analysis revealed that, the films are nanocrystalline in nature with rhombohedral structure. The optical studies showed that α-Fe2O3 thin film exhibits 3.02 eV band gap energy and it decreases to 2.95 eV as the Mn doping percentage in it was increased from 0 to 8 wt.%. The SILAR grown α-Fe2O3 film exhibits antib...

  14. Electric field-tunable BaxSr1-xTiO3 films with high figures of merit grown by molecular beam epitaxy

    Science.gov (United States)

    Mikheev, Evgeny; Kajdos, Adam P.; Hauser, Adam J.; Stemmer, Susanne

    2012-12-01

    We report on the dielectric properties of BaxSr1-xTiO3 (BST) films grown by molecular beam epitaxy on epitaxial Pt bottom electrodes. Paraelectric films (x ≲ 0.5) exhibit dielectric losses that are similar to those of BST single crystals and ceramics. Films with device quality factors greater than 1000 and electric field tunabilities exceeding 1:5 are demonstrated. The results provide evidence for the importance of stoichiometry control and the use of a non-energetic deposition technique for achieving high figures of merit of tunable devices with BST thin