WorldWideScience

Sample records for cathode sputtering

  1. Fundamental aspects of cathodic sputtering

    International Nuclear Information System (INIS)

    Harman, R.

    1979-01-01

    The main fundamental aspects and problems of cathodic sputtering used mainly for thin film deposition and sputter etching are discussed. Among many types of known sputtering techniques the radiofrequency /RF/ diode sputtering is the most universal one and is used for deposition of metals, alloys, metallic compounds, semiconductors and insulators. It seems that nowadays the largest number of working sputtering systems is of diode type. Sometimes also the dc or rf triode sputtering systems are used. The problems in these processes are practically equivalent and comparable with the problems in the diode method and therefore our discussion will be, in most cases applicable for both, the diode and triode methods

  2. Sputter deposition of BSCCO films from a hollow cathode

    International Nuclear Information System (INIS)

    Lanagan, M.T.; Kampwirth, R.T.; Doyle, K.; Kowalski, S.; Miller, D.; Gray, K.E.

    1991-01-01

    High-T c superconducting thin films were deposited onto MgO single crystal substrates from a hollow cathode onto ceramic targets with the nominal composition of Bi 2 Sr 2 CaCu 2 O x . Films similar in composition to those used for the targets were deposited on MgO substrates by rf sputtering. The effects of sputtering time, rf power, and post-annealing on film microstructure and properties were studied in detail. Substrate temperature was found to have a significant influence on the film characteristics. Initial results show that deposition rates from a hollow cathode are an order of magnitude higher than those of a planar magnetron source at equivalent power levels. Large deposition rates allow for the coating of long lengths of wire

  3. High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

    Science.gov (United States)

    Sproul, William D.; Rudnik, Paul J.; Graham, Michael E.; Rohde, Suzanne L.

    1990-01-01

    Attention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.

  4. Carbon dust formation in a cold plasma from cathode sputtering

    International Nuclear Information System (INIS)

    Arnas, C.; Mouberi, A.; Hassouni, K.; Michau, A.; Lombardi, G.; Bonnin, X.; Benedic, F.; Pegourie, B.

    2009-01-01

    Nanoparticles are produced in argon glow plasmas where carbon is introduced by sputtering of a graphite cathode. A scaling law of growth is reported on as a function of the discharge time. Two successive stages of growth of concomitant agglomeration and carbon deposition are observed, followed by a final stage of growth by carbon deposition. A model of formation of molecular precursors by coagulation of neutral clusters on the one hand and of neutral-negative clusters on the other hand is presented, based on formation enthalpy and cluster geometry.

  5. Carbon dust formation in a cold plasma from cathode sputtering

    Science.gov (United States)

    Arnas, C.; Mouberi, A.; Hassouni, K.; Michau, A.; Lombardi, G.; Bonnin, X.; Bénédic, F.; Pégourié, B.

    2009-06-01

    Nanoparticles are produced in argon glow plasmas where carbon is introduced by sputtering of a graphite cathode. A scaling law of growth is reported on as a function of the discharge time. Two successive stages of growth of concomitant agglomeration and carbon deposition are observed, followed by a final stage of growth by carbon deposition. A model of formation of molecular precursors by coagulation of neutral clusters on the one hand and of neutral-negative clusters on the other hand is presented, based on formation enthalpy and cluster geometry.

  6. A flexible platform for simulations of sputtering hollow cathode discharges for laser applications

    NARCIS (Netherlands)

    Mihailova, D.B.; Grozeva, M.; Hagelaar, G.J.M.; Dijk, van J.; Brok, W.J.M.; Mullen, van der J.J.A.M.

    2008-01-01

    The Plasimo modelling platform, extended with a cathode wall sputtering module is used to study the discharge processes and to optimise the design parameters of a sputtering hollow cathode discharge (HCD). We present Plasimo simulations of a HCD used for laser applications. A time dependent

  7. Hot zirconium cathode sputtered layers for useful surface modification

    International Nuclear Information System (INIS)

    Duckworth, R.G.

    1986-01-01

    It has been found that multilayer zirconium based sputtered coatings can greatly improve the wear properties of a wide variety of mechanical components, machine tools, and metal surfaces. Although a hot (approximately 1000 0 C) cathode is employed, temperature sensitive components can be beneficially treated, and for precision parts a total coating thickness of only 0.5μm is often perfectly effective. Even at the highest coating rates substrate temperatures are below 300 0 C. For the corrosion protection of less well finished surfaces thicker layers are usually required and it is important that relatively stress free layers are produced. The authors employed a variety of tailored zirconium/zirconium nitride/zirconium oxide mixed layers to solve a number of tribological problems for some 5 or 6 years. However, it is only recently that they designed, built, and commissioned rapid cycle, multiple cathode, load-lock plant for economic production of such coatings. This paper provides an introduction to this method of depositing pure zirconium and pure synthetic zirconium nitride films

  8. Contribution to crystallographical and mechanical analysis of molybdenum coatings prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1989-07-01

    Molybdenum coatings with different compression stresses are obtained by magnetron cathode sputtering by varying negative voltage applied to the substrate during deposition. Stress evolution, crystal texture and argon content are studied [fr

  9. Cathodic arc sputtering of functional titanium oxide thin films, demonstrating resistive switching

    Energy Technology Data Exchange (ETDEWEB)

    Shvets, Petr, E-mail: pshvets@innopark.kantiana.ru; Maksimova, Ksenia; Demin, Maxim; Dikaya, Olga; Goikhman, Alexander

    2017-05-15

    The formation of thin films of the different stable and metastable titanium oxide phases is demonstrated by cathode arc sputtering of a titanium target in an oxygen atmosphere. We also show that sputtering of titanium in vacuum yields the formation of titanium silicides on the silicon substrate. The crystal structure of the produced samples was investigated using Raman spectroscopy and X-ray diffraction. We conclude that cathode arc sputtering is a flexible method suitable for producing the functional films for electronic applications. The functionality is verified by the memory effect demonstration, based on the resistive switching in the titanium oxide thin film structure.

  10. Magnetron sputtering system with an annual discharge zone and two cathode modules

    International Nuclear Information System (INIS)

    Savich, V. A.; Yasyunas, A. A.; Kovrigo, V. M.; Kotov, D. A.; Shiripov, V. Ya.

    2013-01-01

    In this article, general discharge characteristics of a cylindrical magnetron sputtering system with an annual sputtering zone and a high target usage coefficient designed for transparent conducting coatings are shown. Two coupled DC-cathodes are used to improve coating uniformity. Radial sputtered material fluxes are being created. The engineered magnetic system is extremely balanced (G-factor is much higher than 2) and thus provides maximal effective operating power higher than 6 kW. The effectiveness of a magnetic trap results in a fast work cycle (less than 1.5 min) and a high target material usage coefficient (higher than 40%). A multipole magnetic field with null magnetic flux density zones lower target’s surface is being created. There is an influence between cathode modules despite mutual magnetic isolation, so magnetic conductors-shunts are used to weaken it. The magnetron can be used to sputter both metals and conducting ceramics (including ITO). (authors)

  11. Geometrical features in longitudinal sputtering hollow cathode discharges for laser applications

    NARCIS (Netherlands)

    Mihailova, D.B.; Dijk, van J.; Hagelaar, G.J.M.; Karatodorov, S.; Zahariev, P.; Grozeva, M.; Mullen, van der J.J.A.M.

    2012-01-01

    Longitudinal sputtering hollow cathode discharge (HCD) used as active medium for lasing is studied by means of numerical modelling. Due to the longitudinal non-uniformities of the discharge, the laser operation could be strongly affected. The non-uniformity of the discharge is mainly influenced by

  12. Magnetron sputtered zinc oxide nanorods as thickness-insensitive cathode interlayer for perovskite planar-heterojunction solar cells.

    Science.gov (United States)

    Liang, Lusheng; Huang, Zhifeng; Cai, Longhua; Chen, Weizhong; Wang, Baozeng; Chen, Kaiwu; Bai, Hua; Tian, Qingyong; Fan, Bin

    2014-12-10

    Suitable electrode interfacial layers are essential to the high performance of perovskite planar heterojunction solar cells. In this letter, we report magnetron sputtered zinc oxide (ZnO) film as the cathode interlayer for methylammonium lead iodide (CH3NH3PbI3) perovskite solar cell. Scanning electron microscopy and X-ray diffraction analysis demonstrate that the sputtered ZnO films consist of c-axis aligned nanorods. The solar cells based on this ZnO cathode interlayer showed high short circuit current and power conversion efficiency. Besides, the performance of the device is insensitive to the thickness of ZnO cathode interlayer. Considering the high reliability and maturity of sputtering technique both in lab and industry, we believe that the sputtered ZnO films are promising cathode interlayers for perovskite solar cells, especially in large-scale production.

  13. Nitrogen Atom Energy Distributions in a Hollow-cathode Planar Sputtering Magnetron

    International Nuclear Information System (INIS)

    Ruzic, D.N.; Goeckner, M.J.; Cohen, S.A.; Wang, Zhehui

    1999-01-01

    Energy distributions of N atoms in a hollow-cathode planar sputtering magnetron were obtained by use of optical emission spectroscopy. A characteristic line, N I 8216.3 , well-separated from molecular nitrogen emission bands, was identified. Jansson's nonlinear spectral deconvolution method, refined by minimization of χ w ampersand sup2; , was used to obtain the optimal deconvolved spectra. These showed nitrogen atom energies from 1 eV to beyond 500 eV. Based on comparisons with VFTRIM results, we propose that the energetic N atoms are generated from N 2 + ions after these ions are accelerated through the sheath and dissociatively reflect from the cathode

  14. Contribution to mechanical and crystallographic analysis of molyledenum layers prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1988-01-01

    Molybdenum coatings presenting different compression stresses are elaborated by magnetron cathode sputtering by varying the negative voltage of the substrate during deposition. Stress evolution is accompanied by crystal texture evolution and argon content incorporated in the layers. Crystallite orientation is explained by a phenomenon similar to canalisation observed in ion implantation. In a same deposit each component presents its own deformations different from neighbouring components [fr

  15. Effect of sputtered lanthanum hexaboride film thickness on field emission from metallic knife edge cathodes

    Science.gov (United States)

    Kirley, M. P.; Novakovic, B.; Sule, N.; Weber, M. J.; Knezevic, I.; Booske, J. H.

    2012-03-01

    We report experiments and analysis of field emission from metallic knife-edge cathodes, which are sputter-coated with thin films of lanthanum hexaboride (LaB6), a low-work function material. The emission current is found to depend sensitively on the thickness of the LaB6 layer. We find that films thinner than 10 nm greatly enhance the emitted current. However, cathodes coated with a thicker layer of LaB6 are observed to emit less current than the uncoated metallic cathode. This result is unexpected due to the higher work function of the bare metal cathode. We show, based on numerical calculation of the electrostatic potential throughout the structure, that the external (LaB6/vacuum) barrier is reduced with respect to uncoated samples for both thin and thick coatings. However, this behavior is not exhibited at the internal (metal/LaB6) barrier. In thinly coated samples, electrons tunnel efficiently through both the internal and external barrier, resulting in current enhancement with respect to the uncoated case. In contrast, the thick internal barrier in thickly coated samples suppresses current below the value for uncoated samples in spite of the lowered external barrier. We argue that this coating thickness variation stems from a relatively low (no higher than 1018 cm-3) free carrier density in the sputtered polycrystalline LaB6.

  16. Study of some structural properties of hydrogenated amorphous silicon thin films prepared by radiofrequency cathodic sputtering

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Barhdadi, A.

    2001-08-01

    In this work, we have used the grazing X-rays reflectometry technique to characterise hydrogenated amorphous silicon thin films deposited by radio-frequency cathodic sputtering. Relfectometry measurements are taken immediately after films deposition as well as after having naturally oxidised their surfaces during a more or less prolonged stay in the ambient. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears when the stay in the ambient is so long. (author)

  17. Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux

    International Nuclear Information System (INIS)

    Bogaerts, Annemie; Okhrimovskyy, Andriy; Baguer, Neyda; Gijbels, Renaat

    2005-01-01

    A model is developed for a cylindrical hollow cathode discharge (HCD), with an axial gas flow (entering through a hole in the cathode bottom). The model combines a commercial computational fluid dynamics program 'FLUENT' to compute the gas flow, with home-developed Monte Carlo and fluid models for the plasma behaviour. In this paper, we focus on the behaviour of the sputtered atoms, and we investigate how the gas flow affects the sputtered atom density profiles and the fluxes, which is important for sputter deposition. The sputtered atom density profiles are not much affected by the gas flow. The flux, on the other hand, is found to be significantly enhanced by the gas flow, but in the present set-up it is far from uniform in the radial direction at the open end of the HCD, where a substrate for deposition could be located

  18. On the non-linear nature of the variation, with intensity, of high energy cathode sputtering, and the variation of the latter with temperature (1960)

    International Nuclear Information System (INIS)

    Cassignol, C.; Ranc, G.

    1960-01-01

    A new cathode sputtering theory at high energy is presented which has been elaborated in taking in account the non-linearity of this phenomenon with the density of the impinging ions. This theory allows to predict the influence of target temperature on the rate of cathode sputtering. This influence is experimentally demonstrated. (author) [fr

  19. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    Energy Technology Data Exchange (ETDEWEB)

    Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  20. Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3:Mo

    International Nuclear Information System (INIS)

    Delahoy, A.E.; Guo, S.Y.; Paduraru, C.; Belkind, A.

    2004-01-01

    A method for thin-film deposition has been studied. The method is based on metal sputtering in a hollow cathode configuration with supply of a reactive gas in the vicinity of the substrate. The working gas and entrained sputtered atoms exit the cathode through an elongated slot. The reactive gas is thereby largely prevented from reaching the target. The basic operation of the cathode was studied using a Cu target and pulsed power excitation. These studies included the dependence of deposition rate on power, pressure, and flow rate, film thickness profiles, and film resistivity as a function of substrate conditions. Modeling was conducted to calculate the gas velocity distribution and pressure inside the cavity. Al 2 O 3 films were prepared in a reactive environment of oxygen by sputtering an Al target. It was demonstrated that only a very small amount of oxygen passing through the cathode will oxidize (poison) the target, whereas large quantities of oxygen supplied externally to the cathode need not affect the target at all. A very stable discharge and ease of Al 2 O 3 formation were realized in this latter mode. The method was applied to the preparation of transparent, conductive films of ZnO doped with either Al or B. High deposition rates were achieved, and, at appropriate oxygen flow rates, low film resistivities. High-mobility In 2 O 3 :Mo transparent conductors were also prepared, with resistivities as low as 1.9x10 -4 Ω cm. Scaling relations for hollow cathodes, and deposition efficiency, and process comparisons between magnetron sputtering and linear, reactive-environment, hollow cathode sputtering are presented

  1. Radio frequency magnetron sputter-deposited indium tin oxide for use as a cathode in transparent organic light-emitting diode

    International Nuclear Information System (INIS)

    Chung, Choong-Heui; Ko, Young-Wook; Kim, Yong-Hae; Sohn, Choong-Yong; Hye Yong Chu; Ko Park, Sang-Hee; Lee, Jin Ho

    2005-01-01

    Indium tin oxide (ITO) films were prepared by radio frequency magnetron sputtering at room temperature, for use as a cathode in a transparent organic light-emitting diode (TOLED). To minimize damage to the TOLED by the ITO sputtering process, the target-to-substrate distance was increased to 20 cm. An ITO film deposited at the optimum oxygen partial pressure exhibited an electrical resistivity as low as 4.06 x 10 -4 Ω cm and a high optical transmittance of 91% in the visible range. The film was used as a transparent cathode for a TOLED with structure of an ITO coated glass substrate / Naphthylphenyldiamide (60 nm) / Tris-(8-hydroxyquinoline) aluminum (60 nm) / LiF (1 nm) / Al (2 nm) / Ag (8 nm) / ITO cathode (100 nm). A maximum luminance of 37,000 cd/m 2 was obtained. The device performance was comparable to a conventional OLED

  2. Specific power reduction of an ion source due to heating and cathode sputtering of electrodes

    International Nuclear Information System (INIS)

    Hamilton, G.U.; Semashko, N.N.

    The potentialities and limitations of the water-cooled ion-optical system of the ion source designed for continuous operation of the high-power neutral beam injector are determined. The following problems are analyzed: thermal expansion and deformation of electrodes, electrode sputtering as a result of bombardment, and heat transfer to turbulent flow of water

  3. The improvement of all-solid-state electrochromic devices fabricated with the reactive sputter and cathodic arc technology

    Directory of Open Access Journals (Sweden)

    Min-Chuan Wang

    2016-11-01

    Full Text Available The all-solid-state electrochromic device (ECD with the one substrate structure fabricated by the reactive dc magnetron sputtering (DCMS and cathodic vacuum arc plasma (CVAP technology has been developed for smart electrochromic (EC glass application. The EC layer and ion conductor layer were deposited by reactive DCMS and CVAP technology, respectively. The ion conductor layer Ta2O5 deposited by the CVAP technology has provided the better porous material structure for ion transportation and showed 1.76 times ion conductivity than devices with all sputtering process. At the same time, the EC layer WO3 and NiO deposited by the reactive DCMS have also provided the high quality and uniform characteristic to overcome the surface roughness effect of the CVAP ion conductor layer in multilayer device structure. The all-solid-state ECD with the CVAP ion conductor layer has demonstrated a maximum transmittance variation (ΔT of 55% at 550nm and a faster-switching speed. Furthermore, the lower equipment cost and higher deposition rate could be achieved by the application of CVAP technology.

  4. LiCoO.sub.2./sub. thin-film cathodes grown by RF sputtering

    Czech Academy of Sciences Publication Activity Database

    Prachařová, Jarmila; Přidal, Jiří; Bludská, Jana; Jakubec, Ivo; Vorlíček, Vladimír; Málková, Zuzana; Makris, D. T.; Giorgi, R.; Jastrabík, Lubomír

    2002-01-01

    Roč. 108, - (2002), s. 204-212 ISSN 0378-7753 R&D Projects: GA MŠk ME 305 Institutional research plan: CEZ:AV0Z1010914 Keywords : LiCoO 3 * thin-film cathodes * Li- ion batteries Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.777, year: 2002

  5. Cathode and ion-luminescence of Eu:ZnO thin films prepared by reactive magnetron sputtering and plasma decomposition of non-volatile precursors

    Energy Technology Data Exchange (ETDEWEB)

    Gil-Rostra, Jorge [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, C/Américo Vespucio 49, E-41092 Sevilla (Spain); Ferrer, Francisco J. [Centro Nacional de Aceleradores, CSIC, Univ. Sevilla, Av. Thomas A. Edison 7, E-41092 Sevilla (Spain); Martín, Inocencio R. [Departamento de Física Fundamental y Experimental, Electrónica y Sistemas, U. La Laguna, C/Astrofísico Francisco Sánchez s/n, E-38206 La Laguna, Santa Cruz de Tenerife (Spain); González-Elipe, Agustín R.; Yubero, Francisco [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, C/Américo Vespucio 49, E-41092 Sevilla (Spain)

    2016-10-15

    This paper reports the luminescent behavior of Eu:ZnO thin films prepared by an one-step procedure that combines reactive magnetron sputtering deposition of ZnO with the plasma activated decomposition of a non-volatile acetylacetonate precursor of Eu sublimated in an effusion cell. Chemical composition and microstructure of the Eu:ZnO thin films have been characterized by several methods and their photo-, cathode- and ion-luminescent properties studied as a function of Eu concentration. The high transparency and well controlled optical properties of the films have demonstrated to be ideal for the development of cathode- and ion- luminescence sensors.

  6. Characterization of sputter deposited thin film scandate cathodes for miniaturized thermionic converter applications

    Science.gov (United States)

    Zavadil, Kevin R.; Ruffner, Judith H.; King, Donald B.

    1999-01-01

    We have successfully developed a method for fabricating scandate-based thermionic emitters in thin film form. The primary goal of our effort is to develop thin film emitters that exhibit low work function, high intrinsic electron emissivity, minimum thermal activation properties and that can be readily incorporated into a microgap converter. Our approach has been to incorporate BaSrO into a Sc2O3 matrix using rf sputtering to produce thin films. Diode testing has shown the resulting films to be electron emissive at temperatures as low as 900 K with current densities of 0.1 mA.cm-2 at 1100 K and saturation voltages. We calculate an approximate maximum work function of 1.8 eV and an apparent emission constant (Richardson's constant, A*) of 36 mA.cm-2.K-2. Film compositional and structural analysis shows that a significant surface and subsurface alkaline earth hydroxide phase can form and probably explains the limited utilization and stability of Ba and its surface complexes. The flexibility inherent in sputter deposition suggests alternate strategies for eliminating undesirable phases and optimizing thin film emitter properties.

  7. Niobium-based catalysts prepared by reactive radio-frequency magnetron sputtering and arc plasma methods as non-noble metal cathode catalysts for polymer electrolyte fuel cells

    International Nuclear Information System (INIS)

    Ohnishi, Ryohji; Katayama, Masao; Takanabe, Kazuhiro; Kubota, Jun; Domen, Kazunari

    2010-01-01

    Two vacuum methods, reactive radio-frequency (RF) magnetron sputtering and arc plasma deposition, were used to prepare niobium-based catalysts for an oxygen reduction reaction (ORR) as non-noble metal cathodes for polymer electrode fuel cells (PEFCs). Thin films with various N and O contents, denoted as NbO x and Nb-O-N, were prepared on glassy carbon plates by RF magnetron sputtering with controlled partial pressures of oxygen and nitrogen. Electrochemical measurements indicated that the introduction of the nitrogen species into the thin film resulted in improved ORR activity compared to the oxide-only film. Using an arc plasma method, niobium was deposited on highly oriented pyrolytic graphite (HOPG) substrates, and the sub-nanoscale surface morphology of the deposited particles was investigated using scanning tunneling microscopy (STM). To prepare practical cathode catalysts, niobium was deposited on carbon black (CB) powders by arc plasma method. STM and transmission electron microscopy observations of samples on HOPG and CB indicated that the prepared catalysts were highly dispersed at the atomic level. The onset potential of oxygen reduction on Nb-O-N/CB was 0.86 V vs. a reversible hydrogen electrode, and the apparent current density was drastically improved by the introduction of nitrogen.

  8. Dense and high-stability Ti2AlN MAX phase coatings prepared by the combined cathodic arc/sputter technique

    Science.gov (United States)

    Wang, Zhenyu; Liu, Jingzhou; Wang, Li; Li, Xiaowei; Ke, Peiling; Wang, Aiying

    2017-02-01

    Ti2AlN belongs to a family of ternary nano-laminate alloys known as the MAX phases, which exhibit a unique combination of metallic and ceramic properties. In the present work, the dense and high-stability Ti2AlN coating has been successfully prepared through the combined cathodic arc/sputter deposition, followed by heat post-treatment. It was found that the as-deposited Ti-Al-N coating behaved a multilayer structure, where (Ti, N)-rich layer and Al-rich layer grew alternately, with a mixed phase constitution of TiN and TiAlx. After annealing at 800 °C under vacuum condition for 1.5 h, although the multilayer structure still was found, part of multilayer interfaces became indistinct and disappeared. In particular, the thickness of the Al-rich layer decreased in contrast to that of as-deposited coating due to the inner diffusion of the Al element. Moreover, the Ti2AlN MAX phase emerged as the major phase in the annealed coatings and its formation mechanism was also discussed in this study. The vacuum thermal analysis indicated that the formed Ti2AlN MAX phase exhibited a high-stability, which was mainly benefited from the large thickness and the dense structure. This advanced technique based on the combined cathodic arc/sputter method could be extended to deposit other MAX phase coatings with tailored high performance like good thermal stability, high corrosion and oxidation resistance etc. for the next protective coating materials.

  9. Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, J., E-mail: julian.fischer@kit.edu [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Adelhelm, C.; Bergfeldt, T. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Chang, K. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 46 52074 Aachen (Germany); Ziebert, C.; Leiste, H.; Stüber, M.; Ulrich, S. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Music, D.; Hallstedt, B. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 46 52074 Aachen (Germany); Seifert, H.J. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials, Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2013-01-01

    Today most commercially available lithium ion batteries are still based on the toxic and expensive LiCoO{sub 2} as a standard cathode material. However, lithium manganese based cathode materials are cheaper and environmentally friendlier. In this work cubic-LiMn{sub 2}O{sub 4} spinel, monoclinic-Li{sub 2}MnO{sub 3} and orthorhombic-LiMnO{sub 2} thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (LiMn{sub 2}O{sub 4}, LiMnO{sub 2}) in a pure argon discharge. The deposition parameters, namely target power and working gas pressure, were optimized in a combination with a post deposition heat treatment with respect to microstructure and electrochemical behavior. The chemical composition was determined using inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The films' crystal structure, phase evolution and morphology were investigated by X-ray diffraction, micro Raman spectroscopy and scanning electron microscopy. Due to the fact that these thin films consist of the pure active material without any impurities, such as binders or conductive additives like carbon black, they are particularly well suited for measurements of the intrinsic physical properties, which is essential for fundamental understanding. The electrochemical behavior of the cubic and the orthorhombic films was investigated by galvanostatic cycling in half cells against metallic lithium. The cubic spinel films exhibit a maximum specific capacity of ∼ 82 mAh/g, while a specific capacity of nearly 150 mAh/g can be reached for the orthorhombic counterparts. These films are promising candidates for future all solid state battery applications. - Highlights: ► Synthesis of 3 Li–Mn–O structures by one up-scalable thin film deposition method ► Formation of o-LiMnO{sub 2} by r.f. magnetron sputtering in combination with post-annealing ► Discharge capacity with o-LiMnO{sub 2} cathodes twice as high as for c

  10. Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

    International Nuclear Information System (INIS)

    Fischer, J.; Adelhelm, C.; Bergfeldt, T.; Chang, K.; Ziebert, C.; Leiste, H.; Stüber, M.; Ulrich, S.; Music, D.; Hallstedt, B.; Seifert, H.J.

    2013-01-01

    Today most commercially available lithium ion batteries are still based on the toxic and expensive LiCoO 2 as a standard cathode material. However, lithium manganese based cathode materials are cheaper and environmentally friendlier. In this work cubic-LiMn 2 O 4 spinel, monoclinic-Li 2 MnO 3 and orthorhombic-LiMnO 2 thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (LiMn 2 O 4 , LiMnO 2 ) in a pure argon discharge. The deposition parameters, namely target power and working gas pressure, were optimized in a combination with a post deposition heat treatment with respect to microstructure and electrochemical behavior. The chemical composition was determined using inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The films' crystal structure, phase evolution and morphology were investigated by X-ray diffraction, micro Raman spectroscopy and scanning electron microscopy. Due to the fact that these thin films consist of the pure active material without any impurities, such as binders or conductive additives like carbon black, they are particularly well suited for measurements of the intrinsic physical properties, which is essential for fundamental understanding. The electrochemical behavior of the cubic and the orthorhombic films was investigated by galvanostatic cycling in half cells against metallic lithium. The cubic spinel films exhibit a maximum specific capacity of ∼ 82 mAh/g, while a specific capacity of nearly 150 mAh/g can be reached for the orthorhombic counterparts. These films are promising candidates for future all solid state battery applications. - Highlights: ► Synthesis of 3 Li–Mn–O structures by one up-scalable thin film deposition method ► Formation of o-LiMnO 2 by r.f. magnetron sputtering in combination with post-annealing ► Discharge capacity with o-LiMnO 2 cathodes twice as high as for c-LiMn 2 O 4 ► Thin film deposition of m-Li 2 MnO 3 and

  11. Natural and gamma radiation-induced conduction of silica and metaphosphate glass layers deposed by radiofrequency cathode sputtering

    International Nuclear Information System (INIS)

    Serra, Andre

    1977-01-01

    We present a study of natural and 60 Co induced conductions in radiofrequency sputtering deposed layers. Capacimetry and electronic microscopy observations permit a knowledge of the physical characteristics, mainly: homogeneity and thickness of these layers. A study of the natural current permit to characterise electrically the deposited films, the electrode and bulk insulator effects. In induced conduction, the behaviour of currents as a function of dose rate is interpreted in terms of ROSE'S and FOWLER'S photoconductivity theories. Induced currents versus applied fields are observed and compared with these obtained in the case of dielectric liquids and glasses. (author) [fr

  12. Structural transformation of sputtered o-LiMnO2 thin-film cathodes induced by electrochemical cycling

    International Nuclear Information System (INIS)

    Fischer, J.; Chang, K.; Ye, J.; Ulrich, S.; Ziebert, C.; Music, D.; Hallstedt, B.; Seifert, H.J.

    2013-01-01

    Orthorhombic LiMnO 2 (o-LiMnO 2 ) thin films were produced by non-reactive r.f. magnetron sputtering in combination with thermal post-annealing. Oxide phase formation was investigated by X-ray diffraction and Raman spectroscopy. In order to assign the X-ray signals and estimate the grain size, a simulation of the diffraction pattern was performed and compared with experimental data. The density of the films was determined to be 3.39 g/cm 3 using X-ray reflectivity. Electrochemical characterization was carried out by galvanostatic cycling and cyclic voltammetry of Li/o-LiMnO 2 half cells. There are distinct redox reactions at approx. 3 V and 4 V, whereas the latter splits into multiple peaks. Using ab initio calculations and thermodynamic models, Gibbs energies of o-LiMnO 2 and c-LiMn 2 O 4 were determined. The relation between these energies explains the irreversible phase transformation that has been observed during the cycling of the Li/o-LiMnO 2 half cell. - Highlights: • Quantitative, thermodynamic modeling of the o-LiMnO 2 /c-LiMn 2 O 4 phase transformation • First CV-investigations on magnetron sputtered nanocrystalline o-LiMnO 2 thin films • Synthesis of o-LiMnO 2 planar model systems for protective coating and SEI development

  13. Epitaxial growth of high temperature superconductors by cathodic sputtering I: thin films of YBaCuO

    International Nuclear Information System (INIS)

    Navacerrada, M.A.; Sefrioui, Z.; Arias, D.; Varela, M.; Loos, G.; Leon, C.; Lucia, M.L.; Santamaria, J.; Sanchez-Quesada, F.

    1998-01-01

    High quality c-oriented YBa 2 Cu 3 O 7 -x thin films have been grown on SrTiO 3 (100)substrates by high pressure sputtering in pure oxygen atmosphere. Low angle X-ray diffraction and atomic force microscopy were performed on films less than 250 angstrom thick showing a plenitude better than one unit cell. Moreover, the structural characterization by means of X ray φ scans showed that growth is epitaxial. The critical temperature has been measured by different ways and was always in the range 89.5-90.5K. the resistance transition is sharper than 1K and the mutual inductance response always shows magnetic losses peaks narrower than 0.3K. Critical current densities are in excess of 10''''6 angstrom/cm''''2 at 77K. (Author) 8 refs

  14. Structural transformation of sputtered o-LiMnO{sub 2} thin-film cathodes induced by electrochemical cycling

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, J., E-mail: Julian.Fischer@kit.edu [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials – Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Chang, K. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 52074 Aachen (Germany); Ye, J.; Ulrich, S.; Ziebert, C. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials – Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Music, D.; Hallstedt, B. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 52074 Aachen (Germany); Seifert, H.J. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials – Applied Materials Physics (IAM-AWP), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2013-12-31

    Orthorhombic LiMnO{sub 2} (o-LiMnO{sub 2}) thin films were produced by non-reactive r.f. magnetron sputtering in combination with thermal post-annealing. Oxide phase formation was investigated by X-ray diffraction and Raman spectroscopy. In order to assign the X-ray signals and estimate the grain size, a simulation of the diffraction pattern was performed and compared with experimental data. The density of the films was determined to be 3.39 g/cm{sup 3} using X-ray reflectivity. Electrochemical characterization was carried out by galvanostatic cycling and cyclic voltammetry of Li/o-LiMnO{sub 2} half cells. There are distinct redox reactions at approx. 3 V and 4 V, whereas the latter splits into multiple peaks. Using ab initio calculations and thermodynamic models, Gibbs energies of o-LiMnO{sub 2} and c-LiMn{sub 2}O{sub 4} were determined. The relation between these energies explains the irreversible phase transformation that has been observed during the cycling of the Li/o-LiMnO{sub 2} half cell. - Highlights: • Quantitative, thermodynamic modeling of the o-LiMnO{sub 2}/c-LiMn{sub 2}O{sub 4} phase transformation • First CV-investigations on magnetron sputtered nanocrystalline o-LiMnO{sub 2} thin films • Synthesis of o-LiMnO{sub 2} planar model systems for protective coating and SEI development.

  15. Preparation and characterization of magnetic nanostructures based on FeCo / IrMn deposited by cathode sputtering

    International Nuclear Information System (INIS)

    Pereira, Saulo Milani

    2011-01-01

    Spintronic devices based in the transport of spin polarized current, spin's torque and other related phenomena represent big promises in the scenery of the technological miniaturization of current electronic devices. Magnetic materials of great technological relevance for different areas deal with, despite some exceptions, films and multilayered structures with high complexity. Advances on these fields require the control of those structures in atomic scale, in order to be able to tailor their physical properties. The purpose of this work is the preparation of multilayered structures by sputtering, as well the study of magnetic phenomena involved in this structures. The aim is to produce a spin valve. This is a multilayer structure composed of two ferromagnetic layers, separated by a non magnetic spacer. The magnetisation of one of the ferromagnetic layers is free to rotate under the effect of small external fields, whilst the magnetisation of the other ferromagnetic layer remains fixed by means exchange coupling to a antiferromagnetic layer. The structure is tailored to allow the small applied magnetic fields to switch the magnetisation of the ferromagnetic layers from antiparallel state to a parallel state resulting in the variation of the electrical resistivity of the structure (GMR effect). Optimization of deposition conditions was required to obtain structures with exchange bias coupling, and antiferromagnetic coupling through a non magnetic spacer. The correlation between the deposition conditions and the magnetic properties of the films was studied. The work presented in this dissertation has contributed to the characterisation of both magnetic thin films, which can be used on the production of magnetic sensors, and the new sputtering system assembled in the Applied Physics Laboratory of CDTN. (author)

  16. Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hans, M., E-mail: hans@mch.rwth-aachen.de; Baben, M. to; Music, D.; Ebenhöch, J.; Schneider, J. M. [Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Primetzhofer, D. [Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, S-75120 Uppsala (Sweden); Kurapov, D.; Arndt, M.; Rudigier, H. [Oerlikon Balzers Coating AG, Iramali 18, LI-9496 Balzers, Principality of Liechtenstein (Liechtenstein)

    2014-09-07

    Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the coatings was determined by means of elastic recoil detection analysis and energy dispersive X-ray spectroscopy. The effect of oxygen incorporation on the stress-free lattice parameters and Young's moduli of Ti-Al-O-N coatings was investigated by X-ray diffraction and nanoindentation, respectively. As nitrogen is substituted by oxygen, implications for the charge balance may be expected. A reduction in equilibrium volume with increasing O concentration is identified by X-ray diffraction and density functional theory calculations of Ti-Al-O-N supercells reveal the concomitant formation of metal vacancies. Hence, the oxygen incorporation-induced formation of metal vacancies enables charge balancing. Furthermore, nanoindentation experiments reveal a decrease in elastic modulus with increasing O concentration. Based on ab initio data, two causes can be identified for this: First, the metal vacancy-induced reduction in elasticity; and second, the formation of, compared to the corresponding metal nitride bonds, relatively weak Ti-O and Al-O bonds.

  17. Structural evolution of bias sputtered LiNi0.5Mn1.5O4 thin film cathodes for lithium ion batteries

    International Nuclear Information System (INIS)

    Su, Shih-Hsuan; Chiu, Kuo-Feng; Leu, Hoang-Jyh

    2014-01-01

    LiNi 0.5 Mn 1.5 O 4 (LNMO) thin films have been deposited on stainless steel substrates using radio frequency (f = 13.56 MHz) magnetron sputtering, followed by thermal annealing in ambient atmosphere. Various negative biases were applied on the substrates during deposition. The structural evolution of LNMO thin films under different negative biases has been investigated and characterized by X-ray diffraction. All of the deposited films exhibit a crystalline spinel structure with a space group of Fd-3m, which is a so-called disordered phase. The results also indicate that particle size decreases with increasing negative bias. The electrochemical properties of the LNMO thin films as cathode materials for lithium ion batteries were investigated. Two distinctive voltage plateaus at ∼ 4.7 V and at ∼ 4.0 V (vs. Li + /Li) can be observed in the discharge curves, corresponding to the reactions of the disordered phase. The capacity of LNMO thin film electrodes under suitable negative bias can be optimized. - Highlights: • LiNi 0.5 Mn 1.5 O 4 thin films have been deposited on stainless steel substrates. • Various negative biases were applied on the substrates during deposition. • The particle sizes of LNMO thin films decrease with increasing negative bias

  18. Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering

    International Nuclear Information System (INIS)

    Hans, M.; Baben, M. to; Music, D.; Ebenhöch, J.; Schneider, J. M.; Primetzhofer, D.; Kurapov, D.; Arndt, M.; Rudigier, H.

    2014-01-01

    Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the coatings was determined by means of elastic recoil detection analysis and energy dispersive X-ray spectroscopy. The effect of oxygen incorporation on the stress-free lattice parameters and Young's moduli of Ti-Al-O-N coatings was investigated by X-ray diffraction and nanoindentation, respectively. As nitrogen is substituted by oxygen, implications for the charge balance may be expected. A reduction in equilibrium volume with increasing O concentration is identified by X-ray diffraction and density functional theory calculations of Ti-Al-O-N supercells reveal the concomitant formation of metal vacancies. Hence, the oxygen incorporation-induced formation of metal vacancies enables charge balancing. Furthermore, nanoindentation experiments reveal a decrease in elastic modulus with increasing O concentration. Based on ab initio data, two causes can be identified for this: First, the metal vacancy-induced reduction in elasticity; and second, the formation of, compared to the corresponding metal nitride bonds, relatively weak Ti-O and Al-O bonds

  19. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

    OpenAIRE

    Schroeder, Jeremy; Thomson, W.; Howard, B.; Schell, N.; Näslund, Lars-Åke; Rogström, Lina; Johansson-Jöesaar, Mats P.; Ghafoor, Naureen; Odén, Magnus; Nothnagel, E.; Shepard, A.; Greer, J.; Birch, Jens

    2015-01-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (greater than50 keV), high photon flux (greater than10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (less than1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation...

  20. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation.

    Science.gov (United States)

    Schroeder, J L; Thomson, W; Howard, B; Schell, N; Näslund, L-Å; Rogström, L; Johansson-Jõesaar, M P; Ghafoor, N; Odén, M; Nothnagel, E; Shepard, A; Greer, J; Birch, J

    2015-09-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (>50 keV), high photon flux (>10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument.

  1. Geometric considerations in magnetron sputtering

    International Nuclear Information System (INIS)

    Thornton, J.A.

    1982-01-01

    The recent development of high performance magnetron type discharge sources has greatly enhaced the range of coating applications where sputtering is a viable deposition process. Magnetron sources can provide high current densities and sputtering rates, even at low pressures. They have much reduced substrate heating rates and can be scaled to large sizes. Magnetron sputter coating apparatuses can have a variety of geometric and plasma configurations. The target geometry affects the emission directions of both the sputtered atoms and the energetic ions which are neutralized and reflected at the cathode. This fact, coupled with the long mean free particle paths which are prevalent at low pressures, can make the coating properties very dependent on the apparatus geometry. This paper reviews the physics of magnetron operation and discusses the influences of apparatus geometry on the use of magnetrons for rf sputtering and reactive sputtering, as well as on the microstructure and internal stresses in sputtered metallic coatings. (author) [pt

  2. The deposition of 3C-SiC thin films onto the (111) and (110) faces of Si using pulsed sputtering of a hollow cathode

    Czech Academy of Sciences Publication Activity Database

    Huguenin-Love, J.L.; Lauer, N.T.; Soukup, R. J.; Ianno, N.J.; Kment, Štěpán; Hubička, Zdeněk

    645-648, 1-2 (2010), s. 131-134 ISSN 0255-5476. [International Conference on Silicon Carbide and Related Materials Location /13./. Nurnberg, 11.10.2009-16.10.2009] Institutional research plan: CEZ:AV0Z10100522 Keywords : sputtering * pulse * germanium * 3C Subject RIV: BM - Solid Matter Physics ; Magnetism

  3. Co-sputtered optical films

    Energy Technology Data Exchange (ETDEWEB)

    Misiano, C; Simonetti, E [Selenia S.p.A., Rome (Italy)

    1977-06-01

    The co-sputtering of two dielectric materials with indices of refraction as widely different as possible has been investigated with the aim of obtaining both homogeneous films with an intermediate index of refraction and inhomogeneous films with predetermined profiles. An rf sputtering module is described which has been especially designed, with two separate cathodes and two independent tunable rf generators. The substrates are placed on a circular anode rotating underneath the two cathodes. So far mainly CeO/sub 2/, TiO2 and SiO/sub 2/ targets have been used. The deposition rate from each cathode and the total film thickness are determined by means of two quartz thickness monitors, sputtering compatible. Values obtained for the refractive index and optical thickness are reported, as well as repeatability, mechanical and chemical characteristics, reliability and high power optical radiation resistance. Finally, results obtained on optical components of practical interest are discussed.

  4. The Kansas State University revolving sputter source

    International Nuclear Information System (INIS)

    Tipping, T.N.

    1989-01-01

    It has been that the perfect ion source is one which runs in a very stable mode, runs continuously, and has the ability to change ion species without sacrificing the previous two requirements. This paper presents an approximation to the perfect ion source, the KSU Revolving Sputter Source. The source consists of an Aarhus-geometry sputter source with the addition of a rotating wheel which holds eight sputter cathodes. The wheel consists of a front plate with eight fixed Macor insulators and a back plate with eight Macor insulators held in place by the tension of eight springs. The cathode assembly consists of a copper cartridge with a threaded rod on one end and a sputter cathode with a threaded hole on the back. The cathode is screwed onto the cartridge and the whole assembly may be loaded into the wheel. A small spring on the side of the cartridge holds the assembly in the wheel

  5. Deposition of hematite Fe.sub.2./sub.O.sub.3./sub. thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

    Czech Academy of Sciences Publication Activity Database

    Hubička, Zdeněk; Kment, Štěpán; Olejníček, Jiří; Čada, Martin; Kubart, T.; Brunclíková, Michaela; Kšírová, Petra; Adámek, Petr; Remeš, Zdeněk

    2013-01-01

    Roč. 549, Dec (2013), s. 184-191 ISSN 0040-6090 R&D Projects: GA ČR GAP108/12/2104; GA MŠk LH12043 Grant - others:AVČR(CZ) M100101215 Institutional support: RVO:68378271 Keywords : HIPIMS * thin films * hollow cathode Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.867, year: 2013

  6. On the non-linear nature of the variation, with intensity, of high energy cathode sputtering, and the variation of the latter with temperature (1960); Sur le caractere non lineaire en fonction de l'intensite de la pulverisation cathodique a haute energie et sa variation en fonction de la temperature (1960)

    Energy Technology Data Exchange (ETDEWEB)

    Cassignol, C; Ranc, G [Commissariat a l' Energie Atomique, Saclay (France).Centre d' Etudes Nucleaires

    1960-07-01

    A new cathode sputtering theory at high energy is presented which has been elaborated in taking in account the non-linearity of this phenomenon with the density of the impinging ions. This theory allows to predict the influence of target temperature on the rate of cathode sputtering. This influence is experimentally demonstrated. (author) [French] On presente, au sujet de la pulverisation cathodique a haute energie, une theorie qui tient compte de la non-linearite de la variation de ce phenomene avec la densite des ions incidents. Cette theorie permet de predire l'influence de la temperature de la cible sur la vitesse de pulverisation cathodique. On demontre l'existence de cette influence par une methode experimentale. (auteur)

  7. Comparative study of structural and electro-optical properties of ZnO:Ga films grown by steered cathodic arc plasma evaporation and sputtering on plastic and their application on polymer-based organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Chih-Hao, E-mail: dataman888@hotmail.com [R& D Division, Walsin Technology Corporation, Kaohsiung, Taiwan (China); Hsiao, Yu-Jen [National Nano Device Laboratories, National Applied Research Laboratories, Tainan, Taiwan (China); Hwang, Weng-Sing [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China)

    2016-08-01

    Ga-doped ZnO (GZO) films with various thicknesses (105–490 nm) were deposited on PET substrates at a low temperature of 90 °C by a steered cathodic arc plasma evaporation (steered CAPE), and a GZO film with a thickness of 400 nm was deposited at 90 °C by a magnetron sputtering (MS) for comparison. The comparative analysis of the microstructure, residual stress, surface morphology, electrical and optical properties, chemical states, and doping efficiency of the films produced by the steered CAPE and MS processes was performed, and the effect of thickness on the CAPE-grown GZO films was investigated in detail. The results showed that the GZO films grown by steered CAPE exhibited higher crystallinity and lower internal stress than those deposited by MS. The transmittance and electrical properties were also enhanced for the steered CAPE-grown films. The figure of merit (Φ = T{sup 10}/R{sub s}, where T is the transmittance and R{sub s} is the sheet resistance in Ω/□). was used to evaluate the performance of the electro-optical properties. The GZO films with a thickness of 400 nm deposited by CAPE had the highest Φ value, 1.94 × 10{sup −2} Ω{sup −1}, a corresponding average visible transmittance of 88.8% and resistivity of 6.29 × 10{sup −4} Ω·cm. In contrast, the Φ value of MS-deposited GZO film with a thickness of 400 nm is only 1.1 × 10{sup −3} Ω{sup −1}. This can be attributed to the increase in crystalline size, [0001] preferred orientation, decrease in stacking faults density and Ar contamination in steered CAPE-grown films, leading to increases in the Hall mobility and carrier density. In addition, the power conversion efficiency (PCE) of organic solar cells was significantly improved by using the CAPE-grown GZO electrode, and the PCE values were 1.2% and 1.7% for the devices with MS-grown and CAPE-grown GZO electrodes, respectively. - Highlights: • ZnO:Ga (GZO) films were grown on PET by steered cathodic arc plasma evaporation (CAPE

  8. Dependence of the constitution, microstructure and electrochemical behaviour of magnetron sputtered Li-Ni-Mn-Co-O thin film cathodes for lithium-ion batteries on the working gas pressure and annealing conditions

    International Nuclear Information System (INIS)

    Strafela, Marc; Fischer, Julian; Leiste, Harald; Rinke, Monika; Bergfeldt, Thomas; Seifert, Hans Juergen; Ulrich, Sven; Music, Denis; Chang, Keke; Schneider, Jochen

    2017-01-01

    Li(Ni 1/3 Mn 1/3 Co 1/3 )O 2 as a cathode material for lithium ion batteries shows good thermal stability, high reversible capacity (290 mAh g -1 ), good rate capability and better results in terms of environmental friendliness. In this paper thin film cathodes in the material system Li-Ni-Mn-Co-O were deposited onto silicon and stainless steel substrates, by non-reactive r.f. magnetron sputtering from a ceramic Li 1.18 (Ni 0.39 Mn 0.19 Co 0.35 )O 1.97 target at various argon working gas pressures between 0.2 Pa and 20 Pa. A comprehensive study on the composition and microstructure was carried out. The results showed that the elemental composition varies depending on argon working gas pressure. The elemental composition was determined by inductively coupled plasma optical emission spectroscopy in combination with carrier gas hot extraction. The films showed different grain orientations depending argon working gas pressures. The degree of cation order in the lattice structure of the films deposited at 0.5 Pa and 7 Pa argon working gas pressure, was increased by annealing in an argon/oxygen atmosphere at different pressures for one hour. The microstructure of the films varies with annealing gas pressure and is characterized using X-ray diffraction and unpolarized micro-Raman spectroscopy at room temperature. Electrochemical characterization of as-deposited and annealed films was carried out by galvanostatic cycling in Li-Ni-Mn-Co-O half-cells against metallic lithium. Correlations between process parameters, constitution, microstructure and electrochemical behaviour are discussed in detail.

  9. Dependence of the constitution, microstructure and electrochemical behaviour of magnetron sputtered Li-Ni-Mn-Co-O thin film cathodes for lithium-ion batteries on the working gas pressure and annealing conditions

    Energy Technology Data Exchange (ETDEWEB)

    Strafela, Marc; Fischer, Julian; Leiste, Harald; Rinke, Monika; Bergfeldt, Thomas; Seifert, Hans Juergen; Ulrich, Sven [Karlsruhe Institute of Technology (KIT), Karlsruhe (Germany). Inst. for Applied Materials (IAM); Music, Denis; Chang, Keke; Schneider, Jochen [RWTH Aachen Univ. (Germany). Materials Chemistry

    2017-11-15

    Li(Ni{sub 1/3}Mn{sub 1/3}Co{sub 1/3})O{sub 2} as a cathode material for lithium ion batteries shows good thermal stability, high reversible capacity (290 mAh g{sup -1}), good rate capability and better results in terms of environmental friendliness. In this paper thin film cathodes in the material system Li-Ni-Mn-Co-O were deposited onto silicon and stainless steel substrates, by non-reactive r.f. magnetron sputtering from a ceramic Li{sub 1.18}(Ni{sub 0.39}Mn{sub 0.19}Co{sub 0.35})O{sub 1.97} target at various argon working gas pressures between 0.2 Pa and 20 Pa. A comprehensive study on the composition and microstructure was carried out. The results showed that the elemental composition varies depending on argon working gas pressure. The elemental composition was determined by inductively coupled plasma optical emission spectroscopy in combination with carrier gas hot extraction. The films showed different grain orientations depending argon working gas pressures. The degree of cation order in the lattice structure of the films deposited at 0.5 Pa and 7 Pa argon working gas pressure, was increased by annealing in an argon/oxygen atmosphere at different pressures for one hour. The microstructure of the films varies with annealing gas pressure and is characterized using X-ray diffraction and unpolarized micro-Raman spectroscopy at room temperature. Electrochemical characterization of as-deposited and annealed films was carried out by galvanostatic cycling in Li-Ni-Mn-Co-O half-cells against metallic lithium. Correlations between process parameters, constitution, microstructure and electrochemical behaviour are discussed in detail.

  10. Sputtered catalysts

    International Nuclear Information System (INIS)

    Tyerman, W.J.R.

    1978-01-01

    A method is described for preparing a supported catalyst by a sputtering process. A material that is catalytic, or which is a component of a catalytic system, is sputtered on to the surface of refractory oxide particles that are compatible with the sputtered material and the sputtered particles are consolidated into aggregate form. The oxide particles before sputtering should have a diameter in the range 1000A to 50μ and a porosity less than 0.4 ml/g, and may comprise MgO, Al 2 O 3 or SiO 2 or mixtures of these oxides, including hydraulic cement. The particles may possess catalytic activity by themselves or in combination with the catalytic material deposited on them. Sputtering may be effected epitaxially and consolidation may be effected by compaction pelleting, extrusion or spray drying of a slurry. Examples of the use of such catalysts are given. (U.K.)

  11. Electronic sputtering

    International Nuclear Information System (INIS)

    Johnson, R.E.

    1989-01-01

    Electronic sputtering covers a range of phenomena from electron and photon stimulated desorption from multilayers to fast heavy ion-induced desorption (sputtering) of biomolecules. In this talk the author attempted. Therefore, to connect the detailed studies of argon ejection from solid argon by MeV ions and keV electrons to the sputtering of low temperatures molecular ices by MeV ions then to biomolecule ejection from organic solids. These are related via changing (dE/dx) e , molecular size, and transport processes occurring in materials. In this regard three distinct regions of (dE/dx) e have been identified. Since the talk this picture has been made explicit using a simple spike model for individual impulsive events in which spike interactions are combined linearly. Since that time also the molecular dynamics programs (at Virginia and Uppsala) have quantified both single atom and dimer processes in solid Ar and the momentum transport in large biomolecule sputtering. 5 refs

  12. Barium-Dispenser Thermionic Cathode

    Science.gov (United States)

    Wintucky, Edwin G.; Green, M.; Feinleib, M.

    1989-01-01

    Improved reservoir cathode serves as intense source of electrons required for high-frequency and often high-output-power, linear-beam tubes, for which long operating lifetime important consideration. High emission-current densities obtained through use of emitting surface of relatively-low effective work function and narrow work-function distribution, consisting of coat of W/Os deposited by sputtering. Lower operating temperatures and enhanced electron emission consequently possible.

  13. Sputtering in a glow discharge ion source - pressure dependence: theory and experiment

    International Nuclear Information System (INIS)

    Mason, R.S.; Pichilingi, Melanie

    1994-01-01

    A simplified theoretical expression has been developed for a glow discharge to show how the average cathode erosion rate (expressed as the number of atoms per ion of the total bombarding flux) varies with primary sputter yield, pressure, 'diffusion length' and sputtered atom 'stopping' cross section. An inverse pressure dependence is predicted which correlates well with experiment in the 2 and He, tend to converge. It is suggested that this could be due to a change in the mechanism to self-sputtering. Under constant conditions, the erosion rates of different cathode materials still correlate quite well with the differences in their primary sputter yields. (author)

  14. Carbonaceous Particles Production in a Sputtering Discharge

    International Nuclear Information System (INIS)

    Dominique, Claire; Sant, Marco; Arnas, Cecile

    2005-01-01

    Spherical dust particles have been produced in argon glow discharge by sputtering of a graphite cathode. Their size varies from 40 to 200 nm depending on the distance between the two electrodes and the largest ones have a cauliflower shape. Simulations giving the evolution of the energy distribution of sputtered carbon atoms suggest a mechanism of growth by carbon vapour condensation. The chemical composition and structure of particles have been investigated by infrared spectroscopy and appear to be a complex arrangement of the carbon atoms and hetero-atoms

  15. Isotope puzzle in sputtering

    International Nuclear Information System (INIS)

    Zheng Liping

    1998-01-01

    Mechanisms affecting multicomponent material sputtering are complex. Isotope sputtering is the simplest in the multicomponent materials sputtering. Although only mass effect plays a dominant role in the isotope sputtering, there is still an isotope puzzle in sputtering by ion bombardment. The major arguments are as follows: (1) At the zero fluence, is the isotope enrichment ejection-angle-independent or ejection-angle-dependent? (2) Is the isotope angular effect the primary or the secondary sputter effect? (3) How to understand the action of momentum asymmetry in collision cascade on the isotope sputtering?

  16. Data compilation of angular distributions of sputtered atoms

    International Nuclear Information System (INIS)

    Yamamura, Yasunori; Takiguchi, Takashi; Tawara, Hiro.

    1990-01-01

    Sputtering on a surface is generally caused by the collision cascade developed near the surface. The process is in principle the same as that causing radiation damage in the bulk of solids. Sputtering has long been regarded as an undesirable dirty effect which destroys the cathodes and grids in gas discharge tubes or ion sources and contaminates plasma and the surrounding walls. However, sputtering is used today for many applications such as sputter ion sources, mass spectrometers and the deposition of thin films. Plasma contamination and the surface erosion of first walls due to sputtering are still the major problems in fusion research. The angular distribution of the particles sputtered from solid surfaces can possibly provide the detailed information on the collision cascade in the interior of targets. This report presents a compilation of the angular distribution of sputtered atoms at normal incidence and oblique incidence in the various combinations of incident ions and target atoms. The angular distribution of sputtered atoms from monatomic solids at normal incidence and oblique incidence, and the compilation of the data on the angular distribution of sputtered atoms are reported. (K.I.)

  17. Cathode-sputtered Ti-Zr-N-C-O base hard coatings and stability of said coatings on hard metals and working steels. Kathodenzerstaeubte Hartstoffschichten auf Basis Ti-Zr-N-C-O und deren Stabilitaet auf Hartmetall und Gebrauchsstaehlen

    Energy Technology Data Exchange (ETDEWEB)

    Boehmer, M.

    1986-02-26

    This paper deals with the examination of the metallurgical and thermal stability of the resistant material layers of titanium in connection with the substrate material influence. As substrate material were chosen: hard metal (81% WC, 12% TiC+TaC, 7% Co), high speed steel (DIN 1.3343), austenitic nickel chromium steel (X5 CrNi 18 9) and unalloyed tool steel (DIN 1.1545). The hard materials of titanium were deposited by means of cathode evaporation.

  18. Analysis of cathode geometry to minimize cathode erosion in direct current microplasma jet

    Energy Technology Data Exchange (ETDEWEB)

    Causa, Federica [Dipartimento di Scienze dell' Ambiente, della Sicurezza, del Territorio, degli Alimenti e della Salute, Universita degli studi di Messina, 98122 Messina (Italy); Ghezzi, Francesco; Caniello, Roberto; Grosso, Giovanni [Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Via R. Cozzi 53, 20125 Milano (Italy); Dellasega, David [Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Via R. Cozzi 53, 20125 Milano (Italy); Dipartimento di Energia, Politecnico di Milano, Via Ponzio 34/3, 20133 Milano (Italy)

    2012-12-15

    Microplasma jets are now widely used for deposition, etching, and materials processing. The present study focuses on the investigation of the influence of cathode geometry on deposition quality, for microplasma jet deposition systems in low vacuum. The interest here is understanding the influence of hydrogen on sputtering and/or evaporation of the electrodes. Samples obtained with two cathode geometries with tapered and rectangular cross-sections have been investigated experimentally by scanning electron microscopy and energy dispersion X-ray spectroscopy. Samples obtained with a tapered-geometry cathode present heavy contamination, demonstrating cathode erosion, while samples obtained with a rectangular-cross-section cathode are free from contamination. These experimental characteristics were explained by modelling results showing a larger radial component of the electric field at the cathode inner wall of the tapered cathode. As a result, ion acceleration is larger, explaining the observed cathode erosion in this case. Results from the present investigation also show that the ratio of radial to axial field components is larger for the rectangular geometry case, thus, qualitatively explaining the presence of micro-hollow cathode discharge over a wide range of currents observed in this case. In the light of the above findings, the rectangular cathode geometry is considered to be more effective to achieve cleaner deposition.

  19. Ion-induced sputtering

    International Nuclear Information System (INIS)

    Yamamura, Yasumichi; Shimizu, Ryuichi; Shimizu, Hazime; Ito, Noriaki.

    1983-01-01

    The research on ion-induced sputtering has been continued for a long time, since a hundred or more years ago. However, it was only in 1969 by Sigmund that the sputtering phenomena were theoretically arranged into the present form. The reason why the importance of sputtering phenomena have been given a new look recently is the application over wide range. This paper is a review centering around the mechanism of causing sputtering and its characteristics. Sputtering is such a phenomenon that the atoms in the vicinity of a solid surface are emitted into vacuum by receiving a part of ion energy, or in other words, it is a kind of irradiation damage in the vicinity of a solid surface. In this meaning, it can be considered that the sputtering based on the ions located on the clean surface of a single element metal is simple, and has already been basically understood. On the contrary, the phenomena can not be considered to be fully understood in the case of alloys and compounds, because these surface conditions under irradiation are not always clear due to segregation and others. In the paper, the physical of sputtering, single element sputtering, the sputtering in alloys and compounds, and the behaviour of emitted particles are explained. Finally, some recent topics of the sputtering measurement by laser resonant excitation, the sputtering by electron excitation, chemical sputtering, and the sputtering in nuclear fusion reactors are described. (Wakatsuki, Y.)

  20. Examining the effects of fill gas pressure on the distribution of copper atoms in a hollow cathode lamp

    International Nuclear Information System (INIS)

    Oliver, D.R.; Finlayson, T.R.

    1996-01-01

    A modified Copper Hollow Cathode lamp has been used to examine the effects of fill gas pressure on the distribution of sputtered Copper atoms in the body of the lamp. The lamp was modified by placing a quartz disc above the cathode, perpendicular to both the cathode bore and the cathode-anode axis. While the lamp is operating, some of the Copper that has been sputtered out of the cathode bore is deposited on the disc. Modified lamps have been operated at a variety of pressures, and the resulting deposition profiles recorded using an optical microscope. A summary of variations between different pressures are presented

  1. Sputtering of water ice

    International Nuclear Information System (INIS)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.; Schou, J.; Shi, M.; Bahr, D.A.; Atteberrry, C.L.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from the decay of H(2p) atoms sputtered by heavy ion impact, but not bulk ice luminescence. Radiolyzed ice does not sputter under 3.7 eV laser irradiation

  2. On peculiarities of using cathodes on tungsten-rhenium alloy base in vacuum luminescent low-voltage indicators

    International Nuclear Information System (INIS)

    Fel'dman, F.S.; Gorfinkel', B.I.; Ustinova, V.G.; Gutkina, G.I.

    1975-01-01

    A comparative study of cathodes prepared from W wire (VAI-AP) and from a W-Re alloy (VAR5) with a cathodoluminophor of ZnO-Zn and carbonate coatings indicates that the initial values of the anode current and the luminophor brightness are almost the same for both cathodes. The stability of the anode current and of the luminescent properties of the luminophor, however, were much better for the VAR5 cathode with a coating of ternary, fine-grained carbonate. This is attributed to the difference in the amount of active material sputtered on the cathode luminophor. The temperature of the alloy cathode is 30-40deg lower than that of the W cathode, which creates favorable conditions for decreasing the sputtering from the cathode. The operational lifetime of the cathode is also increased for this alloy

  3. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  4. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  5. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  6. Argonne inverted sputter source

    International Nuclear Information System (INIS)

    Yntema, J.L.; Billquist, P.J.

    1983-01-01

    The emittance of the inverted sputter source with immersion lenses was measured to be about 5π mm mrad MeV/sup 1/2/ at the 75% level over a wide range of beam intensities. The use of the source in experiments with radioactive sputter targets and hydrogen loaded targets is described. Self contamination of the source is discussed

  7. Sputter deposition of tantalum-nitride films on copper using an rf-plasma

    International Nuclear Information System (INIS)

    Walter, K.C.; Fetherston, R.P.; Sridharan, K.; Chen, A.; Shamim, M.M.; Conrad, J.R.

    1994-01-01

    A tantalum-nitride film was successfully deposited at ambient temperature on copper with a modified ion-assisted-deposition (IAD) technique. The process uses an argon and nitrogen plasma to sputter deposit from a tantalum rf-cathode and ion implant the deposited film simultaneously. Both argon and nitrogen ions are used for sputtering and ion implantation. Auger spectroscopy and x-ray diffraction were used to characterize the resulting film

  8. One-dimensional analysis of the rate of plasma-assisted sputter deposition

    International Nuclear Information System (INIS)

    Palmero, A.; Rudolph, H.; Habraken, F. H. P. M.

    2007-01-01

    In this article a recently developed model [A. Palmero, H. Rudolph, and F. H. P. M. Habraken, Appl. Phys. Lett. 89, 211501 (2006)] is applied to analyze the transport of sputtered material from the cathode toward the growing film when using a plasma-assisted sputtering deposition technique. The argon pressure dependence of the deposition rate of aluminum, silicon, vanadium, chromium, germanium, tantalum, and tungsten under several different experimental conditions has been analyzed by fitting experimental results from the literature to the above-mentioned theory. Good fits are obtained. Three quantities are deduced from the fit: the temperature of the cathode and of the growing film, and the value of the effective cross section for thermalization due to elastic scattering of a sputtered particle on background gas atoms. The values derived from the fits for the growing film and cathode temperature are very similar to those experimentally determined and reported in the literature. The effective cross sections have been found to be approximately the corresponding geometrical cross section divided by the average number of collisions required for the thermalization, implying that the real and effective thermalization lengths have a similar value. Finally, the values of the throw distance appearing in the Keller-Simmons model, as well as its dependence on the deposition conditions have been understood invoking the values of the cathode and film temperature, as well as of the value of the effective cross section. The analysis shows the overall validity of this model for the transport of sputtered particles in sputter deposition

  9. The statistics of sputtering

    International Nuclear Information System (INIS)

    Robinson, M.T.

    1993-01-01

    The MARLOWE program was used to study the statistics of sputtering on the example of 1- to 100-keV Au atoms normally incident on static (001) and (111) Au crystals. The yield of sputtered atoms was examined as a function of the impact point of the incident particles (''ions'') on the target surfaces. There were variations on two scales. The effects of the axial and planar channeling of the ions could be traced, the details depending on the orientation of the target and the energies of the ions. Locally, the sputtering yield was very sensitive to the impact point, small changes in position often producing large changes yield. Results indicate strongly that the sputtering yield is a random (''chaotic'') function of the impact point

  10. Sputtering and inelastic processes

    International Nuclear Information System (INIS)

    Baranov, I.A.; Tsepelevic, S.O.

    1987-01-01

    Experimental data and models of a new type of material sputtering with ions of relatively high energies due to inelastic (electron) processes are reviewed. This area of investigations began to develop intensively during the latest years. New experimental data of the authors on differential characteristics of ultradisperse gold and americium dioxide layers with fission fragments are given as well. Practical applications of the new sputtering type are considered as well as setup of possibl experiments at heavy multiply charged ion accelerators

  11. Nanotube cathodes.

    Energy Technology Data Exchange (ETDEWEB)

    Overmyer, Donald L.; Lockner, Thomas Ramsbeck; Siegal, Michael P.; Miller, Paul Albert

    2006-11-01

    Carbon nanotubes have shown promise for applications in many diverse areas of technology. In this report we describe our efforts to develop high-current cathodes from a variety of nanotubes deposited under a variety of conditions. Our goal was to develop a one-inch-diameter cathode capable of emitting 10 amperes of electron current for one second with an applied potential of 50 kV. This combination of current and pulse duration significantly exceeds previously reported nanotube-cathode performance. This project was planned for two years duration. In the first year, we tested the electron-emission characteristics of nanotube arrays fabricated under a variety of conditions. In the second year, we planned to select the best processing conditions, to fabricate larger cathode samples, and to test them on a high-power relativistic electron beam generator. In the first year, much effort was made to control nanotube arrays in terms of nanotube diameter and average spacing apart. When the project began, we believed that nanotubes approximately 10 nm in diameter would yield sufficient electron emission properties, based on the work of others in the field. Therefore, much of our focus was placed on measured field emission from such nanotubes grown on a variety of metallized surfaces and with varying average spacing between individual nanotubes. We easily reproduced the field emission properties typically measured by others from multi-wall carbon nanotube arrays. Interestingly, we did this without having the helpful vertical alignment to enhance emission; our nanotubes were randomly oriented. The good emission was most likely possible due to the improved crystallinity, and therefore, electrical conductivity, of our nanotubes compared to those in the literature. However, toward the end of the project, we learned that while these 10-nm-diameter CNTs had superior crystalline structure to the work of others studying field emission from multi-wall CNT arrays, these nanotubes still

  12. Nanotube cathodes

    International Nuclear Information System (INIS)

    Overmyer, Donald L.; Lockner, Thomas Ramsbeck; Siegal, Michael P.; Miller, Paul Albert

    2006-01-01

    Carbon nanotubes have shown promise for applications in many diverse areas of technology. In this report we describe our efforts to develop high-current cathodes from a variety of nanotubes deposited under a variety of conditions. Our goal was to develop a one-inch-diameter cathode capable of emitting 10 amperes of electron current for one second with an applied potential of 50 kV. This combination of current and pulse duration significantly exceeds previously reported nanotube-cathode performance. This project was planned for two years duration. In the first year, we tested the electron-emission characteristics of nanotube arrays fabricated under a variety of conditions. In the second year, we planned to select the best processing conditions, to fabricate larger cathode samples, and to test them on a high-power relativistic electron beam generator. In the first year, much effort was made to control nanotube arrays in terms of nanotube diameter and average spacing apart. When the project began, we believed that nanotubes approximately 10 nm in diameter would yield sufficient electron emission properties, based on the work of others in the field. Therefore, much of our focus was placed on measured field emission from such nanotubes grown on a variety of metallized surfaces and with varying average spacing between individual nanotubes. We easily reproduced the field emission properties typically measured by others from multi-wall carbon nanotube arrays. Interestingly, we did this without having the helpful vertical alignment to enhance emission; our nanotubes were randomly oriented. The good emission was most likely possible due to the improved crystallinity, and therefore, electrical conductivity, of our nanotubes compared to those in the literature. However, toward the end of the project, we learned that while these 10-nm-diameter CNTs had superior crystalline structure to the work of others studying field emission from multi-wall CNT arrays, these nanotubes still

  13. Implantation, recoil implantation, and sputtering

    International Nuclear Information System (INIS)

    Kelly, R.

    1984-01-01

    The implantation and sputtering mechanisms which are relevant to ion bombardment of surfaces are described. These are: collision, thermal, electronic and photon-induced sputtering. 135 refs.; 36 figs.; 9 tabs

  14. Cathodic protection -- Rectifier 46

    International Nuclear Information System (INIS)

    Lane, W.M.

    1995-01-01

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system functions as required by project criteria. The cathodic protection system is for the tank farms on the Hanford Reservation. The tank farms store radioactive waste

  15. Cathodic protection -- Rectifier 47

    International Nuclear Information System (INIS)

    Lane, W.M.

    1995-01-01

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system functions as required by project criteria. The cathodic protection system is for the tank farms at the Hanford Reservation. The tank farms store radioactive waste

  16. Physics of ion sputtering

    International Nuclear Information System (INIS)

    Robinson, M.T.

    1984-04-01

    The ejection of atoms by the ion bombardment of solids is discussed in terms of linear collision cascade theory. A simple argument describes the energies of the ejecta, but elaborate models are required to obtain accurate sputtering yields and related quantities. These include transport theoretical models based on linearized Boltzmann equations, computer simulation models based on the binary collision approximation, and classical many-body dynamical models. The role of each kind of model is discussed. Several aspects of sputtering are illustrated by results from the simulation code MARLOWE. 20 references, 6 figures

  17. Experimental study of the discharge in the low pressure plasma jet sputtering system

    Czech Academy of Sciences Publication Activity Database

    Klusoň, J.; Kudrna, P.; Kolpaková, A.; Picková, I.; Hubička, Zdeněk; Tichý, M.

    2013-01-01

    Roč. 53, č. 1 (2013), s. 10-15 ISSN 0863-1042 Institutional support: RVO:68378271 Keywords : hollow cathode * plasma jet sputtering system * Langmuir probe Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.983, year: 2013

  18. Magnetron sputtered gadolinia-doped ceria diffusion barriers for metal-supported solid oxide fuel cells

    DEFF Research Database (Denmark)

    Sønderby, Steffen; Klemensø, Trine; Christensen, Bjarke H.

    2014-01-01

    Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3...

  19. Proton sputtering. Final report

    International Nuclear Information System (INIS)

    Finfgeld, C.R.

    1975-01-01

    This research provides sputtering yields as a function of energy for H + and D + on several representative pure metallic elements, in the absence of surface contaminants. The experimental technique and apparatus are described. Data are given for Au, Co, Ta, W, and Mo

  20. Laser sputtering. Pt. 1

    International Nuclear Information System (INIS)

    Kelly, R.; Cuomo, J.J.; Leary, P.A.; Rothenburg, J.E.; Braren, B.E.; Aliotta, C.F.

    1985-01-01

    Irradiation, i.e. bombardment, with 193 nm laser pulses having an energy fluence of 2.5 J/cm 2 and a duration of proportional12 ns leads to rapid sputtering with Au, Al 2 O 3 , MgO, MgO.Al 2 O 3 , SiO 2 , glass, and LaB 6 , relatively slow sputtering with MgF 2 and diamond, and mainly thermal-stress cracking with W. Scanning electron microscopy (SEM) suggests that the mechanism for the sputtering of Au in either vacuum or air is one based on the hydrodynamics of molten Au, while an SEM-derived surface temperature estimate confirms that thermal sputtering (which might have been expected) is not possible. SEM with W shows that the near total lack of material removal is due to the thermal-stress cracking not leading to completed exfoliation, together with the surface temperature being too low for either hydrodynamical or thermal processes. Corresponding SEM with Al 2 O 3 shows, in the case of specimens bombarded in vacuum, topography of such a type that all mechanisms except electronic ones can be ruled out. The topography of Al 2 O 3 or other oxides bombarded in air through a mask is somewhat different, showing craters as for vacuum bombardments but ones which have a cone-like pattern on the bottom. (orig.)

  1. ZnO film deposition by DC magnetron sputtering: Effect of target configuration on the film properties

    Energy Technology Data Exchange (ETDEWEB)

    Arakelova, E.; Khachatryan, A.; Kteyan, A.; Avjyan, K.; Grigoryan, S.

    2016-08-01

    Ballistic transport model for target-to-substrate atom transfer during magnetron sputter deposition was used to develop zinc target (cathode) configuration that enabled growth of uniform zinc oxide films on extensive surfaces and provided reproducibility of films characteristics irrespective of the cathode wear-out. The advantage of the developed target configuration for high-quality ZnO film deposition was observed in the sputtering pressure range of 5− 50 mTorr, and in the range of cathode-to-substrate distances 7–20 cm. Characteristics of the deposited films were demonstrated by using X-ray diffraction analysis, as well as optical and electrical measurements. - Highlights: • Change of target configuration for optimization of magnetron sputtering deposition is proposed. • Improvement of ZnO film properties due to use of this target is demonstrated. • This configuration provided reproducibility of the deposited films properties.

  2. Improvements in or relating to methods of and apparatus for coating wire, rod or strip material by sputtering

    International Nuclear Information System (INIS)

    Wareing, J.B.

    1976-01-01

    A method and apparatus are described for coating wire, rod or strip material comprising first subjecting the material to electron bombardment in a glow discharge to heat and activate the surface and then subjecting it to sputtering by use of a soft cathode discharge. The apparatus comprises a low pressure gas chamber through which the material is passed, and containing a glow discharge electron gun having a tubular cathode shaped so that the material can be passed axially through it, and an anode surrounding the cathode. The cathode is formed in two parts, the first part at one end, being made of material of low sputtering yield, and the second part being formed at least partially of the required coating material. The first part of the cathode may be of stainless steel or Al. The two parts of the cathode are electrically isolated with means provided for applying a lower negative potential, with respect to the anode, to the second part compared with the first part. The voltage applied to the second part may be controlled so as to control the sputtering rate. The gas pressure in the chamber is also controllable. The coating material may be arranged as inserts in the fixed cathode structure or as segments around the surface to be coated, and may be composed of Pb, Zn or Cu. (U.K.)

  3. Research and Development of a New Field Enhanced Low Temperature Thermionic Cathode that Enables Fluorescent Dimming and Loan Shedding without Auxiliary Cathode Heating

    Energy Technology Data Exchange (ETDEWEB)

    Feng Jin

    2009-01-07

    This is the final report for project entitled 'Research and development of a new field enhanced low temperature thermionic cathode that enables fluorescent dimming and load shedding without auxiliary cathode heating', under Agreement Number: DE-FC26-04NT-42329. Under this project, a highly efficient CNT based thermionic cathode was demonstrated. This cathode is capable of emitting electron at a current density two order of magnitude stronger then a typical fluorescent cathode at same temperatures, or capable of emitting at same current density but at temperature about 300 C lower than that of a fluorescent cathode. Detailed fabrication techniques were developed including CVD growth of CNTs and sputter deposition of oxide thin films on CNTs. These are mature technologies that have been widely used in industry for large scale materials processing and device fabrications, thus, with further development work, the techniques developed in this project can be scaled-up in manufacturing environment. The prototype cathodes developed in this project were tested in lighting plasma discharge environment. In many cases, they not only lit and sustain the plasma, but also out perform the fluorescent cathodes in key parameters such like cathode fall voltages. More work will be needed to further evaluate more detailed and longer term performance of the prototype cathode in lighting plasma.

  4. Investigation of nanoporous platinum thin films fabricated by reactive sputtering: Application as micro-SOFC electrode

    Science.gov (United States)

    Jung, WooChul; Kim, Jae Jin; Tuller, Harry L.

    2015-02-01

    Highly porous Pt thin films, with nano-scale porosity, were fabricated by reactive sputtering. The strategy involved deposition of thin film PtOx at room temperature, followed by the subsequent decomposition of the oxide by rapid heat treatment. The resulting films exhibited percolating Pt networks infiltrated with interconnected nanosized pores, critical for superior solid oxide fuel cell cathode performance. This approach is particularly attractive for micro-fabricated solid oxide fuel cells, since it enables fabrication of the entire cell stack (anode/electrolyte/cathode) within the sputtering chamber, without breaking vacuum. In this work, the morphological, crystallographic and chemical properties of the porous electrode were systematically varied by control of deposition conditions. Oxygen reduction reaction kinetics were investigated by means of electrochemical impedance spectroscopy, demonstrating the critical role of nano-pores in achieving satisfactory micro-SOFC cathode performance.

  5. An introduction to closed field sputtering (CFS) equipment

    International Nuclear Information System (INIS)

    Sugden, G.B.

    1979-01-01

    Ways have been sought to develop the vacuum sputtering process to reduce the source material temperature and to increase the deposition rate. A new industrial plating method superior to vacuum evaporation and electroplating has emerged. In this 'closed field sputtering' processes an electric field is applied between a coaxial anode and cathode and a magnetic field applied orthogonally to the electric field. Providing the flux density of the magnetic field is above a critical value no electrons flow to the anode but move along the magnetic lines around the cathode, enclosed in the magnetic field. A high density electron cloud with high ionization probability is therefore maintained. Low temperature sputtering can be attained due to very low energy loss of electrons at the anode. A pressure of about (2-5) x 10(-4) torr is used. High power can be applied to the equipment without producing much heat. It enables a large number of plastic parts to be coated with almost any nonmagnetic metal and alloys of metals on a commercial basis. It is also possible to produce coatings of oxides. nitrides and carbides of metals. The method of operation and a description of the equipment are given. Applications include car exteriors, household appliances, furniture toys and the electronics industry. (UK)

  6. Deposition and characterization of sputtered hexaboride coatings

    International Nuclear Information System (INIS)

    Waldhauser, W.

    1996-06-01

    Hexaborides of the rare-earth elements ReB 6 are potential materials for cathode applications since they combine properties such as low work function, good electrical conductivity, high melting point as well as low volatility at high temperatures. Due to their high hardness and colorations ranging from blue to purple these compounds are also considered for applications to coatings for decoration of consumer products. At present, either rods of sintered LaB 6 or single LaB 6 crystals are indirectly heated to induce emission. In this workboride coatings were deposited onto various substrates employing non-reactive magnetron sputtering from LaB 6 , CeB 6 , SmB 6 and YB 6 targets. Coatings deposited were examined using scanning electron microscopy, X-ray diffraction, electron probe microanalysis. Vickers microhardness, colorimeter and spectroscopic ellipsometry measurements. Electron emission characteristics of the coatings were studied by the thermionic emission and the contact potential method. After optimization of the sputtering parameters fine-columnar or partially amorphous films with atomic ratios of boron to metal in the order of 5 to 7.5 were obtained. The tendency to form the corresponding hexaboride phase decreases from LaB 6 , CeB 6 and SmB 6 to YB 6 . The work function was measured to be in the range of 2.6 to 3.3 eV. Vickers microhardness values lie between 1500 and 2000 HVO.01. LaB 6 coatings showed the most pronounced visual color impression corresponding to dark violet. The results obtained indicate that sputtered hexaboride films are well suited for decorative and thermionic applications. (author)

  7. Cathodic Protection Model Facility

    Data.gov (United States)

    Federal Laboratory Consortium — FUNCTION: Performs Navy design and engineering of ship and submarine impressed current cathodic protection (ICCP) systems for underwater hull corrosion control and...

  8. Target surface condition during reactive glow discharge sputtering of copper

    International Nuclear Information System (INIS)

    Depla, D; Haemers, J; Gryse, R De

    2002-01-01

    During reactive glow discharge sputtering of copper in an argon/nitrogen plasma, we noticed an abrupt change of the target voltage and the deposition rate when the nitrogen concentration in the plasma exceeds a critical value. To explain this behaviour, the target surface after reactive glow discharge sputtering was examined by x-ray photoelectron spectroscopy (XPS). An experimental arrangement was constructed that allows direct transfer of the glow discharge cathode to the XPS analysis chamber without air exposure. These XPS measurements revealed that several different chemical states of nitrogen are present in the layer that forms on the target surface. The relative concentration of these different states changes when the critical nitrogen concentration in the plasma is exceeded

  9. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  10. Electron energy distribution function in a cathode fall region of DC-glow discharge

    International Nuclear Information System (INIS)

    Elakshar, F.F.; Garamoon, A.A.; Hassouba, M.A.

    1997-01-01

    Recently a substantial effort has been devoted towards the development of a quantitative microscopic measurements in the cathode fall region of the DC-glow discharge magnetron sputtering unit. The electron energy distribution function (EEDF) has been measured using a single Langmuir probe at the edge of the cathode fall. Two groups of electrons are observed in helium and argon gas discharges. The two groups have no chance to be thermalized since they leave the cathode fall region fast. The electron temperature measurements have been compared with spectroscopic determination. Plasma density has been computed and compared with probe measurements. Sources of the two groups of electrons are also discussed. (author)

  11. Process system and method for fabricating submicron field emission cathodes

    Science.gov (United States)

    Jankowski, Alan F.; Hayes, Jeffrey P.

    1998-01-01

    A process method and system for making field emission cathodes exists. The deposition source divergence is controlled to produce field emission cathodes with height-to-base aspect ratios that are uniform over large substrate surface areas while using very short source-to-substrate distances. The rate of hole closure is controlled from the cone source. The substrate surface is coated in well defined increments. The deposition source is apertured to coat pixel areas on the substrate. The entire substrate is coated using a manipulator to incrementally move the whole substrate surface past the deposition source. Either collimated sputtering or evaporative deposition sources can be used. The position of the aperture and its size and shape are used to control the field emission cathode size and shape.

  12. Theory of thermal sputtering

    International Nuclear Information System (INIS)

    Kelly, R.

    1977-01-01

    An energetic ion which is incident on a solid target causes a momentary temperature increase in the impact region, i.e., a so-called thermal spike occurs. Such spikes are capable of causing (or supplementing) disordering, precipitation, crystallization, electronic excitation, stoichiometry change, desorption, and sputtering, it being the contribution to sputtering that is considered here. The approach used is compatible with modern damage-distribution theory. Thus the temperature profile left by the incident ion is taken as a three-dimensional Gaussian with parameters appropriate to power-law scattering, and is used as the initial condition for solving the heat-conduction equation. Let us write this solution as T = T(t, y), where t is time and y is a dimension parallel to the target surface. The vaporization flux from a solid surface is taken as pnsup(1/2)(2π 2 >kT)sup(-1/2), where p, the equilibrium pressure of a vapor species containing n atoms, can be written as p 0 exp(-L/T), p 0 and L are constants largely independent of temperature, and 2 > is the mean mass per atom of target. An equation for the thermal sputtering coefficient is given: after integration the final result takes the form: Ssub(thermal)=pnsup(1/2)[2π 2 >k(Tsub(infinity)+cΔT 0 )]sup(-1/2)πlambda 2 tsub(eff.)atoms/ion, where Tsub(infinity) is the macroscopic target temperature, cΔT 0 is the maximum temperature increase at x = y = 0, p is to be evaluated at T = Tsub(infinity) + cΔT 0 , lambda is the mean atomic spacing of the target, and tsub(eff.) is a quantity with units of time. (author)

  13. Production of intensive negative lithium beam with caesium sputter-type ion source

    Science.gov (United States)

    Lobanov, Nikolai R.

    2018-01-01

    Compounds of lithium oxide, hydroxide and carbonate, mixed with silver, were prepared for use as a cathode in caesium-sputter ion source. The intention was to determine the procedure which would produce the highest intensity negative lithium beams over extended period and with maximum stability. The chemical composition and properties of the samples were analysed using mass-spectrometry, optical microscopy, Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Analyses (EDX) and Raman spectroscopy. These analyses showed that the chemical transformations with components resulted from pressing, storage and bake out were qualitatively in agreement with expectations. Intensive negative lithium ion beams >1 μA were delivered using cathodes fabricated from materials with multicomponent chemical composition when the following conditions were met: (i) use of components with moderate enthalpy of formation; (ii) low moisture content at final stage of cathode production and (iii) small concentration of water molecules in hydrate phase in the cathode mixture.

  14. Role of cathode identity in liquid chromatography particle beam glow discharge mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    Krishna, M.V. Balarama [Department of Chemistry, Biosystems Research Complex, Clemson University, Clemson, SC 29634-1905 (United States); Marcus, R.K. [Department of Chemistry, Biosystems Research Complex, Clemson University, Clemson, SC 29634-1905 (United States)], E-mail: marcusr@clemson.edu

    2008-06-15

    A detailed evaluation of the role of cathode identity on the analytical and spectral characteristics of various organic, organometallic and metal analytes using liquid chromatography-particle beam/glow discharge mass spectrometry (LC-PB/GDMS) has been carried out. A d.c. discharge, operating with argon as the support gas, was used throughout this work. In this study, Cu which has a relatively high sputtering rate, Ni which has moderate sputtering rate and Ta which has very low sputtering rate, are taken as cathode materials to study the ionization, fragmentation, and analytical characteristics of organic (caffeine, epigallocatechin gallate, peptide as representative compounds), organometallic (selenomethionine, triethyl lead chloride as representative compounds) and metal (Fe, La, Cs and Pb) species. A range of discharge gas pressures (26.6-106.4 Pa) and currents (0.2-1.5 mA) were investigated with the test cathodes to determine their influence on the spectral composition and overall analytical response for the various test species. Calibration plots were obtained for all of the species for each of the three cathodes to determine the respective limits of detection. Relative detection limits in the range of 0.02 to 15 ng mL{sup -1} (0.002-1.5 ng, absolute) for the test species were found to be in the order of Cu > Ni > Ta; which follows the order of the sputtering characteristics of the respective cathodes. These studies rendered information about the respective discharge parameters' role in choosing the most appropriate cathode identity in PB-GDMS for application in the areas of organic, organometallic and inorganic species analysis.

  15. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Czech Academy of Sciences Publication Activity Database

    Nietiadi, M.L.; Rosandi, Y.; Lorinčík, Jan; Urbassek, H.M.

    -, č. 303 (2013), s. 205-208 ISSN 0168-583X Institutional support: RVO:67985882 Keywords : Sputtering * Molecular dynamics * SIMS Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 1.186, year: 2013

  16. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  17. Nanostructured sulfur cathodes

    KAUST Repository

    Yang, Yuan

    2013-01-01

    Rechargeable Li/S batteries have attracted significant attention lately due to their high specific energy and low cost. They are promising candidates for applications, including portable electronics, electric vehicles and grid-level energy storage. However, poor cycle life and low power capability are major technical obstacles. Various nanostructured sulfur cathodes have been developed to address these issues, as they provide greater resistance to pulverization, faster reaction kinetics and better trapping of soluble polysulfides. In this review, recent developments on nanostructured sulfur cathodes and mechanisms behind their operation are presented and discussed. Moreover, progress on novel characterization of sulfur cathodes is also summarized, as it has deepened the understanding of sulfur cathodes and will guide further rational design of sulfur electrodes. © 2013 The Royal Society of Chemistry.

  18. Arcjet cathode phenomena

    Science.gov (United States)

    Curran, Francis M.; Haag, Thomas W.; Raquet, John F.

    1989-01-01

    Cathode tips made from a number of different materials were tested in a modular arcjet thruster in order to examine cathode phenomena. Periodic disassembly and examination, along with the data collected during testing, indicated that all of the tungsten-based materials behaved similarly despite the fact that in one of these samples the percentage of thorium oxide was doubled and another was 25 percent rhenium. The mass loss rate from a 2 percent thoriated rhenium cathode was found to be an order of magnitude greater than that observed using 2 percent thoriated tungsten. Detailed analysis of one of these cathode tips showed that the molten crater contained pure tungsten to a depth of about 150 microns. Problems with thermal stress cracking were encountered in the testing of a hafnium carbide tip. Post test analysis showed that the active area of the tip had chemically reacted with the propellant. A 100 hour continuous test was run at about 1 kW. Post test analysis revealed no dendrite formation, such as observed in a 30 kW arcjet lifetest, near the cathode crater. The cathodes from both this test and a previously run 1000 hour cycled test displayed nearly identical arc craters. Data and calculations indicate that the mass losses observed in testing can be explained by evaporation.

  19. Development of an inductively coupled impulse sputtering source for coating deposition

    Science.gov (United States)

    Loch, Daniel Alexander Llewellyn

    In recent years, highly ionised pulsed plasma processes have had a great impact on improving the coating performance of various applications, such as for cutting tools and ITO coatings, allowing for a longer service life and improved defect densities. These improvements stem from the higher ionisation degree of the sputtered material in these processes and with this the possibility of controlling the flux of sputtered material, allowing the regulation of the hardness and density of coatings and the ability to sputter onto complex contoured substrates. The development of Inductively Coupled Impulse Sputtering (ICIS) is aimed at the potential of utilising the advantages of highly ionised plasma for the sputtering of ferromagnetic material. In traditional magnetron based sputter processes ferromagnetic materials would shunt the magnetic field of the magnetron, thus reducing the sputter yield and ionisation efficiency. By generating the plasma within a high power pulsed radio frequency (RF) driven coil in front of the cathode, it is possible to remove the need for a magnetron by applying a high voltage pulsed direct current to the cathode attracting argon ions from the plasma to initiate sputtering. This is the first time that ICIS technology has been deployed in a sputter coating system. To study the characteristics of ICIS, current and voltage waveforms have been measured to examine the effect of increasing RF-power. Plasma analysis has been conducted by optical emission spectroscopy to investigate the excitation mechanisms and the emission intensity. These are correlated to the set RF-power by modelling assumptions based on electron collisions. Mass spectroscopy is used to measure the plasma potential and ion energy distribution function. Pure copper, titanium and nickel coatings have been deposited on silicon with high aspect ratio via to measure the deposition rate and characterise the microstructure. For titanium and nickel the emission modelling results are in

  20. Cathode materials review

    Energy Technology Data Exchange (ETDEWEB)

    Daniel, Claus, E-mail: danielc@ornl.gov; Mohanty, Debasish, E-mail: danielc@ornl.gov; Li, Jianlin, E-mail: danielc@ornl.gov; Wood, David L., E-mail: danielc@ornl.gov [Oak Ridge National Laboratory, 1 Bethel Valley Road, MS6472 Oak Ridge, TN 37831-6472 (United States)

    2014-06-16

    The electrochemical potential of cathode materials defines the positive side of the terminal voltage of a battery. Traditionally, cathode materials are the energy-limiting or voltage-limiting electrode. One of the first electrochemical batteries, the voltaic pile invented by Alessandro Volta in 1800 (Phil. Trans. Roy. Soc. 90, 403-431) had a copper-zinc galvanic element with a terminal voltage of 0.76 V. Since then, the research community has increased capacity and voltage for primary (nonrechargeable) batteries and round-trip efficiency for secondary (rechargeable) batteries. Successful secondary batteries have been the lead-acid with a lead oxide cathode and a terminal voltage of 2.1 V and later the NiCd with a nickel(III) oxide-hydroxide cathode and a 1.2 V terminal voltage. The relatively low voltage of those aqueous systems and the low round-trip efficiency due to activation energies in the conversion reactions limited their use. In 1976, Wittingham (J. Electrochem. Soc., 123, 315) and Besenhard (J. Power Sources 1(3), 267) finally enabled highly reversible redox reactions by intercalation of lithium ions instead of by chemical conversion. In 1980, Goodenough and Mizushima (Mater. Res. Bull. 15, 783-789) demonstrated a high-energy and high-power LiCoO{sub 2} cathode, allowing for an increase of terminal voltage far beyond 3 V. Over the past four decades, the international research community has further developed cathode materials of many varieties. Current state-of-the-art cathodes demonstrate voltages beyond any known electrolyte stability window, bringing electrolyte research once again to the forefront of battery research.

  1. Cathode materials review

    International Nuclear Information System (INIS)

    Daniel, Claus; Mohanty, Debasish; Li, Jianlin; Wood, David L.

    2014-01-01

    The electrochemical potential of cathode materials defines the positive side of the terminal voltage of a battery. Traditionally, cathode materials are the energy-limiting or voltage-limiting electrode. One of the first electrochemical batteries, the voltaic pile invented by Alessandro Volta in 1800 (Phil. Trans. Roy. Soc. 90, 403-431) had a copper-zinc galvanic element with a terminal voltage of 0.76 V. Since then, the research community has increased capacity and voltage for primary (nonrechargeable) batteries and round-trip efficiency for secondary (rechargeable) batteries. Successful secondary batteries have been the lead-acid with a lead oxide cathode and a terminal voltage of 2.1 V and later the NiCd with a nickel(III) oxide-hydroxide cathode and a 1.2 V terminal voltage. The relatively low voltage of those aqueous systems and the low round-trip efficiency due to activation energies in the conversion reactions limited their use. In 1976, Wittingham (J. Electrochem. Soc., 123, 315) and Besenhard (J. Power Sources 1(3), 267) finally enabled highly reversible redox reactions by intercalation of lithium ions instead of by chemical conversion. In 1980, Goodenough and Mizushima (Mater. Res. Bull. 15, 783-789) demonstrated a high-energy and high-power LiCoO 2 cathode, allowing for an increase of terminal voltage far beyond 3 V. Over the past four decades, the international research community has further developed cathode materials of many varieties. Current state-of-the-art cathodes demonstrate voltages beyond any known electrolyte stability window, bringing electrolyte research once again to the forefront of battery research

  2. Cathode materials review

    Science.gov (United States)

    Daniel, Claus; Mohanty, Debasish; Li, Jianlin; Wood, David L.

    2014-06-01

    The electrochemical potential of cathode materials defines the positive side of the terminal voltage of a battery. Traditionally, cathode materials are the energy-limiting or voltage-limiting electrode. One of the first electrochemical batteries, the voltaic pile invented by Alessandro Volta in 1800 (Phil. Trans. Roy. Soc. 90, 403-431) had a copper-zinc galvanic element with a terminal voltage of 0.76 V. Since then, the research community has increased capacity and voltage for primary (nonrechargeable) batteries and round-trip efficiency for secondary (rechargeable) batteries. Successful secondary batteries have been the lead-acid with a lead oxide cathode and a terminal voltage of 2.1 V and later the NiCd with a nickel(III) oxide-hydroxide cathode and a 1.2 V terminal voltage. The relatively low voltage of those aqueous systems and the low round-trip efficiency due to activation energies in the conversion reactions limited their use. In 1976, Wittingham (J. Electrochem. Soc., 123, 315) and Besenhard (J. Power Sources 1(3), 267) finally enabled highly reversible redox reactions by intercalation of lithium ions instead of by chemical conversion. In 1980, Goodenough and Mizushima (Mater. Res. Bull. 15, 783-789) demonstrated a high-energy and high-power LiCoO2 cathode, allowing for an increase of terminal voltage far beyond 3 V. Over the past four decades, the international research community has further developed cathode materials of many varieties. Current state-of-the-art cathodes demonstrate voltages beyond any known electrolyte stability window, bringing electrolyte research once again to the forefront of battery research.

  3. Sputtering and emission intensity of cast irons with different metallurgical structures in a Grimm glow lamp

    International Nuclear Information System (INIS)

    Fujita, M.; Kashima, J.; Naganuma, K.

    1981-01-01

    The cathodic sputtering and emission intensities for the white, gray and malleable cast irons in the Grimm glow lamp are discussed. The intensities of the Fe 247.98-nm line for the samples of the three types depend linearly on the electrical power but the slopes of the plots differ. The intensity of the carbon line at 247.86 nm for malleable cast iron is weaker than those for the others. Sputtering is influenced by the form of the graphite, which can lead to distortion of the electrical field. Graphite on malleable cast iron is sputtered not only as atomic carbon but also as moieties containing several carbon atoms. The higher the supplied voltage, the shorter the time for the intensities of the Fe I and C I lines to reach constant values. (Auth.)

  4. Observation of self-sputtering in energetic condensation of metal ions

    International Nuclear Information System (INIS)

    Anders, Andre

    2004-01-01

    The condensation of energetic metal ions on a surface may cause self-sputtering even in the absence of substrate bias. Charge-state-averaged self-sputtering yields were determined for both zirconium and gold ions generated by a cathodic vacuum arc. Films were deposited on differently biased substrates exposed to streaming Zr and Au vacuum arc plasma. The self-sputtering yields for both metals were estimated to be about 0.05 in the absence of bias, and exceeding 0.5 when bias reached-50 V. These surprisingly high values can be reconciled with binary collision theory and molecular dynamics calculations taking high the kinetic and potential energy of vacuum arc ions into account

  5. Filtered cathodic arc source

    International Nuclear Information System (INIS)

    Falabella, S.; Sanders, D.M.

    1994-01-01

    A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge is described. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45 degree to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles. 3 figures

  6. Inkjet-Printed Porous Silver Thin Film as a Cathode for a Low-Temperature Solid Oxide Fuel Cell.

    Science.gov (United States)

    Yu, Chen-Chiang; Baek, Jong Dae; Su, Chun-Hao; Fan, Liangdong; Wei, Jun; Liao, Ying-Chih; Su, Pei-Chen

    2016-04-27

    In this work we report a porous silver thin film cathode that was fabricated by a simple inkjet printing process for low-temperature solid oxide fuel cell applications. The electrochemical performance of the inkjet-printed silver cathode was studied at 300-450 °C and was compared with that of silver cathodes that were fabricated by the typical sputtering method. Inkjet-printed silver cathodes showed lower electrochemical impedance due to their porous structure, which facilitated oxygen gaseous diffusion and oxygen surface adsorption-dissociation reactions. A typical sputtered nanoporous silver cathode became essentially dense after the operation and showed high impedance due to a lack of oxygen supply. The results of long-term fuel cell operation show that the cell with an inkjet-printed cathode had a more stable current output for more than 45 h at 400 °C. A porous silver cathode is required for high fuel cell performance, and the simple inkjet printing technique offers an alternative method of fabrication for such a desirable porous structure with the required thermal-morphological stability.

  7. Cathode material for lithium batteries

    Science.gov (United States)

    Park, Sang-Ho; Amine, Khalil

    2013-07-23

    A method of manufacture an article of a cathode (positive electrode) material for lithium batteries. The cathode material is a lithium molybdenum composite transition metal oxide material and is prepared by mixing in a solid state an intermediate molybdenum composite transition metal oxide and a lithium source. The mixture is thermally treated to obtain the lithium molybdenum composite transition metal oxide cathode material.

  8. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B V; Clarke, M; Hu, H; Betz, [Newcastle Univ., NSW (Australia). Dept. of Physics

    1994-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  9. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  10. Smart cathodic protection systems

    NARCIS (Netherlands)

    Polder, R.B.; Leggedoor, J.; Schuten, G.; Sajna, S.; Kranjc, A.

    2010-01-01

    Cathodic protection delivers corrosion protection in concrete structures exposed to aggressive environments, e.g. in de-icing salt and marine climates. Working lives of a large number of CP systems are at least more than 13 years and probably more than 25 years, provided a minimum level of

  11. Self-induced optogalvanic effect in a segmented hollow-cathode discharge

    Science.gov (United States)

    Steflekova, V.; Zhechev, D.

    2018-03-01

    Optogalvanic (OG) interaction is simulated and studied in a segmented hollow-cathode discharge (SHCD). HCD-lamps are used to induce an OG signal by their own emission or by that of another lamp. The efficiency of the OG of a Ne/Cu HCD lamp in the range 320-380 nm is estimated theoretically. An irregular galvanic peak arising near the inflection point in the i-V curve (∂V/∂i<0) is detected. Its origin is related to Penning ionization of the sputtered cathode material.

  12. Study of the three-step photoionization of uranium using a hollow cathode discharge tube

    International Nuclear Information System (INIS)

    Hu, Q.; Yin, L.; Zhang, Y.; Jin, C.; Cui, J.; Su, H.; Lin, F.

    1986-01-01

    The hollow cathode discharge (HCD) tube as a spectral light source has been developed. Because any element including refractory metals can be atomized by the cathode sputtering effect in HCD, a simple and reliable atomic vapor source produced by HCD has been widely used in laser spectroscopy. To the authors' knowledge, there is no previous work on the photoionization processes of metal atoms using an HCD tube. Here the authors report their study of the resonant three-step ionization of U in a homemade HCD tube

  13. Faraday screen sputtering on TPX

    International Nuclear Information System (INIS)

    Ehst, D.A.

    1994-12-01

    The TPX design stipulates that the ion-cyclotron resonance frequency (ICRF) antenna must have a Faraday screen (FS). The author considers here possible low Z coatings for the screen, as well as sputtering behavior of the Ni and Ti substrates. The theory of rf-induced sputtering has been developed, and he follows those theoretical approaches. The author's emphasis will be on both impurity generation as a possible source of increased Z eff , and also on actual erosion-lifetime of the materials under worst case conditions

  14. On niobium sputter coated cavities

    International Nuclear Information System (INIS)

    Arnolds-Mayer, G.; Kaufmann, U.; Downar, H.

    1988-01-01

    To coat copper cavities with a thin film of niobium, facilities for electropolishing and sputter deposition have been installed at Dornier. Experiments have been performed on samples to optimize electropolishing and deposition parameters. In this paper, characteristics concerning surface properties, adhesion of the niobium film to the copper substrate, and film properties were studied on planar samples. A 1.5 GHz single cell cavity made from oxygen free high conductivity (OFHC) copper was sputter coated twice. First rf measurements were performed in the temperature range from 300 K to 2 K

  15. Influence of the radial spacing between cathodes on the surface composition of iron samples sintered by hollow cathode electric discharge

    Directory of Open Access Journals (Sweden)

    Brunatto S.F.

    2001-01-01

    Full Text Available The present work reports an investigation of the influence of the radial spacing between cathodes on the iron sintering process by hollow cathode electrical discharge, with surface enrichment of the alloying elements Cr and Ni. Pressed cylindrical samples of 9.5 mm diameter and density of 7.0 ± 0.1 g/cm³ were prepared by compaction of Ancorsteel 1000C iron powder. These samples, constituting the central cathode, were positioned concentrically in the interior of an external cathode machined from a tube of stainless steel AISI 310 (containing: 25% Cr, 16% Ni, 1.5% Mn, 1.5% Si, 0.03% C and the remainder Fe. Sintering was done at 1150 °C, for 120 min, utilizing radial spacings between the central and hollow cathodes of 3, 6 and 9 mm and a gas mixture of 80% Ar and 20% H2, with a flow rate of 5 cm³/s at a pressure of 3 Torr. The electric discharge was generated using a pulsed voltage power source, with a period of 200 mus. The radial spacing had only a slight influence on the quantity of atoms of alloying elements deposited and diffused on the surface of the sample. Analysis with a microprobe showed the presence of chrome (up to 4.0% and nickel (up to 3.0%, in at. % at the surface of the samples. This surface enrichment can be attributed to the mechanism of sputtering of the metallic atoms present in the external cathode, with the deposition of these elements on the sample surface and consequent diffusion within the sample.

  16. Characterization of Ag-doped vanadium oxide (AgxV2O5) thin film for cathode of thin film battery

    International Nuclear Information System (INIS)

    Hwang, H.S.; Oh, S.H.; Kim, H.S.; Cho, W.I.; Cho, B.W.; Lee, D.Y.

    2004-01-01

    The effect of silver co-sputtering on the characteristics of amorphous V 2 O 5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V 2 O 5 films. X-ray diffraction (XRD), Inductively coupled plasma-atomic emission spectrometry (ICP-AES), field emission-scanning electron microscopy (FE-SEM), Fourier transform infrared spectrometry (FT-IR) and X-ray photoelectron spectrometry (XPS) results indicate that the microstructure of the V 2 O 5 films is affected by the rf power of the co-sputtered silver. In addition, an all-solid-state thin film battery with full cell structure of Li/LiPON/Ag x V 2 O 5 /Pt has been fabricated. It is found that the silver co-sputtered V 2 O 5 cathode film exhibits better cycle performance than an undoped one

  17. Air cathode structure manufacture

    Science.gov (United States)

    Momyer, William R.; Littauer, Ernest L.

    1985-01-01

    An improved air cathode structure for use in primary batteries and the like. The cathode structure includes a matrix active layer, a current collector grid on one face of the matrix active layer, and a porous, nonelectrically conductive separator on the opposite face of the matrix active layer, the collector grid and separator being permanently bonded to the matrix active layer. The separator has a preselected porosity providing low IR losses and high resistance to air flow through the matrix active layer to maintain high bubble pressure during operation of the battery. In the illustrated embodiment, the separator was formed of porous polypropylene. A thin hydrophobic film is provided, in the preferred embodiment, on the current collecting metal grid.

  18. Optical characterisation of sputtered hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Chouiyakh, A.; Rjeb, A.; Barhdadi, A.

    2000-09-01

    The present work is devoted to the study of some optical properties of hydrogenated amorphous silicon (a-Si:H) thin films prepared by radio-frequency cathodic sputtering technique. It is essentially focused on investigating separately the effects of increasing partial hydrogen pressure during the deposition stage, and the effects of post deposition thermal annealing on the main optical parameters of the deposited layers (refraction index, optical gap Urbach energy, etc.). We show that low hydrogen pressures allow a saturation of the dangling bonds in the material, while high pressures lead to the creation of new defects. We also show that thermal annealing under moderate temperatures allows a good improvement of the structural quality of deposited films. (author)

  19. Formation and stability of sputtered clusters

    International Nuclear Information System (INIS)

    Andersen, H.H.

    1989-01-01

    Current theory for the formation of sputtered clusters states that either atoms are sputtered individually and aggregate after having left the surface or they are sputtered as complete clusters. There is no totally sharp boundary between the two interpretations, but experimental evidence is mainly thought to favour the latter model. Both theories demand a criterion for the stability of the clusters. In computer simulations of sputtering, the idea has been to use the same interaction potential as in the lattice computations to judge the stability. More qualitatively, simple geometrical shapes have also been looked for. It is found here, that evidence for 'magic numbers' and electron parity effects in clusters have existed in the sputtering literature for a long time, making more sophisticated stability criteria necessary. The breakdown of originally sputtered metastable clusters into stable clusters gives strong support to the 'sputtered as clusters' hypothesis. (author)

  20. Cathode ray tube screens

    International Nuclear Information System (INIS)

    Cockayne, B.; Robbins, D.J.; Glasper, J.L.

    1982-01-01

    An improved cathode ray tube screen is described which consists of a single- or a poly-crystalline slice of a material such as yttrium aluminium garnet in which dopants such as Tb 3 + , Eu 3 + , Ce 3 + or Tm 3 + are ion implanted to different depths or in different areas of the screen. Annealing the screen removes lattice damage caused by the ion implanting and assists the diffusion of the dopant into the crystal. (U.K.)

  1. Arc cathode spots

    International Nuclear Information System (INIS)

    Schrade, H.O.

    1989-01-01

    Arc spots are usually highly unstable and jump statistically over the cathode surface. In a magnetic field parallel to the surface, preferably they move in the retrograde direction; i.e., opposite to the Lorentzian rule. If the field is inclined with respect to the surface, the spots drift away at a certain angle with respect to the proper retrograde direction (Robson drift motion). These well-known phenomena are explained by one stability theory

  2. Cathode ray tube

    International Nuclear Information System (INIS)

    1979-01-01

    A cathode ray tube comprises two electron lens means in combination to crossover the electron beam at a second crossover between the two electron lens means with one of the two lens means having a variable voltage applied thereto to control the location of the beam crossover in order to focus the beam onto a display screen at any location away from the screen center. (Auth.)

  3. Semi-empirical formulas for sputtering yield

    International Nuclear Information System (INIS)

    Yamamura, Yasumichi

    1994-01-01

    When charged particles, electrons, light and so on are irradiated on solid surfaces, the materials are lost from the surfaces, and this phenomenon is called sputtering. In order to understand sputtering phenomenon, the bond energy of atoms on surfaces, the energy given to the vicinity of surfaces and the process of converting the given energy to the energy for releasing atoms must be known. The theories of sputtering and the semi-empirical formulas for evaluating the dependence of sputtering yield on incident energy are explained. The mechanisms of sputtering are that due to collision cascade in the case of heavy ion incidence and that due to surface atom recoil in the case of light ion incidence. The formulas for the sputtering yield of low energy heavy ion sputtering, high energy light ion sputtering and the general case between these extreme cases, and the Matsunami formula are shown. At the stage of the publication of Atomic Data and Nuclear Data Tables in 1984, the data up to 1983 were collected, and about 30 papers published thereafter were added. The experimental data for low Z materials, for example Be, B and C and light ion sputtering data were reported. The combination of ions and target atoms in the collected sputtering data is shown. The new semi-empirical formula by slightly adjusting the Matsunami formula was decided. (K.I.)

  4. Depression cathode structure for cathode ray tubes having surface smoothness and method for producing same

    International Nuclear Information System (INIS)

    Rychlewski, T.V.

    1984-01-01

    Depression cathode structures for cathode ray tubes are produced by dispensing liquid cathode material into the depression of a metallic supporting substrate, removing excess cathode material by passing a doctor blade across the substrate surface and over the depression, and drying the cathode layer to a substantially immobile state. The cathode layer may optionally be further shaped prior to substantially complete drying thereof

  5. Geometrical Aspects of a Hollow-cathode Magnetron (HCM)

    International Nuclear Information System (INIS)

    Cohen, Samuel A.; Wang, Zhehui

    1998-01-01

    A hollow-cathode magnetron (HCM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS), is operable at substantially lower pressures than its planar-magnetron counterpart. We have studied the dependence of magnetron operational parameters on the inner diameter D and length L of a cylindrical HCS. Only when L is greater than L sub zero, a critical length, is the HCM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic or primary electron transport. At pressures above 1 mTorr, an electron-impact ionization model with Bohm diffusion at a temperature equivalent to one-half the primary electron energy and with an ambipolar constraint can explain the ion-electron pair creation required to sustain the discharge. The critical length L sub zero is determined by the magnetization length of the primary electrons

  6. Geometrical aspects of a hollow-cathode planar magnetron

    International Nuclear Information System (INIS)

    Wang, Z.; Cohen, S.A.

    1999-01-01

    A hollow-cathode planar magnetron (HCPM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS) [Z. Wang and S. A. Cohen, J. Vac. Sci. Technol. A 17, 77 (1999)], is operable at substantially lower pressures than its planar-magnetron counterpart. HCPM operational parameters depend on the inner diameter D and length L of its cylindrical HCS. Only when L is greater than L 0 , a critical length, is the HCPM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic electron transport. At pressures above 1 mTorr, Bohm diffusion (temperature congruent primary electron energy), with an ambipolar constraint, can explain the ion - electron pair creation required to sustain the discharge. At the lowest pressure, ∼0.3 mTorr, collision-limited diffusion creates fewer ion - electron pairs than required for steady state and therefore cannot explain the experimental data. The critical length L 0 is consistent with the magnetization length of the primary electrons. copyright 1999 American Institute of Physics

  7. Laser microstructuring and annealing processes for lithium manganese oxide cathodes

    International Nuclear Information System (INIS)

    Proell, J.; Kohler, R.; Torge, M.; Ulrich, S.; Ziebert, C.; Bruns, M.; Seifert, H.J.; Pfleging, W.

    2011-01-01

    It is expected that cathodes for lithium-ion batteries (LIB) composed out of nano-composite materials lead to an increase in power density of the LIB due to large electrochemically active surface areas but cathodes made of lithium manganese oxides (Li-Mn-O) suffer from structural instabilities due to their sensitivity to the average manganese oxidation state. Therefore, thin films in the Li-Mn-O system were synthesized by non-reactive radiofrequency magnetron sputtering of a spinel lithium manganese oxide target. For the enhancement of the power density and cycle stability, large area direct laser patterning using UV-laser radiation with a wavelength of 248 nm was performed. Subsequent laser annealing processes were investigated in a second step in order to set up a spinel-like phase using 940 nm laser radiation at a temperature of 680 deg. C. The interaction processes between UV-laser radiation and the material was investigated using laser ablation inductively coupled plasma mass spectroscopy. The changes in phase, structure and grain shape of the thin films due to the annealing process were recorded using Raman spectroscopy, X-ray diffraction and scanning electron microscopy. The structured cathodes were cycled using standard electrolyte and a metallic lithium anode. Different surface structures were investigated and a significant increase in cycling stability was found. Surface chemistry of an as-deposited as well as an electrochemically cycled thin film was investigated via X-ray photoelectron spectroscopy.

  8. Laser fluorescence spectroscopy of sputtered uranium atoms

    International Nuclear Information System (INIS)

    Wright, R.B.; Pellin, M.J.; Gruen, D.M.; Young, C.E.

    1979-01-01

    Laser induced fluorescence (LIF) spectroscopy was used to study the sputtering of 99.8% 238 U metal foil when bombarded by normally incident 500 to 3000 eV Ne + , Ar + , Kr + , and O 2 + . A three-level atom model of the LIF processes is developed to interpret the observed fluorescent emission from the sputtered species. The model shows that close attention must be paid to the conditions under which the experiment is carried out as well as to the details of the collision cascade theory of sputtering. Rigorous analysis shows that when properly applied, LIF can be used to investigate the predictions of sputtering theory as regards energy distributions of sputtered particles and for the determination of sputtering yields. The possibility that thermal emission may occur during sputtering can also be tested using the proposed model. It is shown that the velocity distribution (either the number density or flux density distribution, depending upon the experimental conditions) of the sputtered particles can be determined using the LIF technique and that this information can be used to obtain a description of the basic sputtering mechanisms. These matters are discussed using the U-atom fluorescence measurements as a basis. The relative sputtering yields for various incident ions on uranium were also measured for the first time using the LIF technique. A surprisingly high fraction of the sputtered uranium atoms were found to occupy the low lying metastable energy levels of U(I). The population of the sputtered metastable atoms were found approximately to obey a Boltzman distribution with an effective temperature of 920 +- 100 0 K. 41 references

  9. Simulation experiments and solar wind sputtering

    International Nuclear Information System (INIS)

    Griffith, J.E.; Papanastassiou, D.A.; Russell, W.A.; Tombrello, T.A.; Weller, R.A.

    1978-01-01

    In order to isolate the role played by solar wind sputtering from other lunar surface phenomena a number of simulation experiments were performed, including isotope abundance measurements of Ca sputtered from terrestrial fluorite and plagioclase by 50-keV and 130-keV 14 N beams, measurement of the energy distribution of U atoms sputtered with 80-keV 40 Ar, and measurement of the fraction of sputtered U atoms which stick on the surfaces used to collect these atoms. 10 references

  10. Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal

    International Nuclear Information System (INIS)

    Li Dejie

    2002-01-01

    In film deposition by sputtering, the oxidation and nitrification of the sputtered material lead to degradation of film quality, particularly with respect to metal sulfide films. We propose to use auxiliary sputtering as a method to produce a fresh film of rare-earth metal, usually dysprosium (Dy), that absorbs the active gases in a sputtering system, greatly reducing the background pressure and protecting the film from oxidation and nitrification effectively. The influence of the auxiliary sputtering power consumption, sputtering time, and medium gas pressure on the background pressure in the vacuum chamber is investigated in detail. If the auxiliary sputtering power exceeds 120 W and the sputtering time is more than 4 min, the background pressure is only one fourth of the ultimate pressure pumped by an oil diffusion pump. The absorption activity of the sputtered Dy film continues at least an hour after completion of the auxiliary sputter. Applied to film deposition of Ti and ZnS, this technique has been proven to be effective. For the Ti film, the total content of N and O is reduced from 45% to 20% when the auxiliary sputtering power of Dy is 120 W, and the sputtering time is 20 min. In the case of ZnS, the content of O is reduced from 8% to 2%

  11. Nanostructured lanthanum manganate composite cathode

    DEFF Research Database (Denmark)

    Wang, Wei Guo; Liu, Yi-Lin; Barfod, Rasmus

    2005-01-01

    that the (La1-xSrx)(y)MnO3 +/-delta (LSM) composite cathodes consist of a network of homogenously distributed LSM, yttria-stabilized zirconia (YSZ), and pores. The individual grain size of LSM or YSZ is approximately 100 nm. The degree of contact between cathode and electrolyte is 39% on average. (c) 2005...

  12. Zn Thin Film Deposition for Fe Layer Shielding Use the Sputtering Technique on Cylindrical Form

    International Nuclear Information System (INIS)

    Yunanto; Tjipto Sujitno, BA; Suprapto; Simbolon, Sahat

    2002-01-01

    Deposition of thin film on Fe substrate use sputtering technique on cylindrical form was carried out. The purpose of this research is to protect Fe due to the corrosion with Zn thin film. Sputtering method was proposed to protect a component of complex form. Substrate has functioned as anode, meanwhile target in cylindrical form as a cathode. Argon ion from anode bombard Zn with enough energy for releasing Zn. Zn atom would scatter and some of then was focused on the anode. For testing Zn atom on Fe by using XRF and corrosion rate with potentiostat. It was found that corrosion rate was decreased from 0.051 mpy to 0.031 mpy on 0.63 % of Fe substrate. (author)

  13. Study of deposition rae coating of Ag thin films by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghanati, M.; Zendehnam, A.

    2003-01-01

    Exact knowledge about deposition rate and its distribution and variation of them with respect to coating parameters (Gas pressure, Distance, discharge current,..) is very vital. In this experimental research coating of Ag thin films by magnetron sputtering have been carried out over Ar pressure range of 10 -2 -10 -1 mbar, and discharge current up to 1000 m.A, and distance between glass substrates to silver target (Cathode) was changed from 5 to 15 cm. The obtained results have been investigated by help of computer curve fitting, and these studies show a very good agreement for the conditions used in this work

  14. DC diode sputtering of titanium: determination of optimal deposition conditions by electrical and spectroscopic investigations

    International Nuclear Information System (INIS)

    Poitevin, J.M.; Lemperiere, G.; Fourrier, C.

    1976-01-01

    An argon DC glow discharge in a diode sputtering system fitted with a titanium cathode is investigated. The first results fix the boundaries of good working conditions for the discharge; mathematical relations are established for the pressure range 40 to 120 mTorr, anode-cathode lengths from 15 to 60 mm and current densities from 0.6 to 2 mA cm -2 . The deposition rate is found to be proportional to the electrical power if the product pd is kept constant, but the ratio of the deposition rate to discharge power exhibits a maximum for d approximately equal 1.5 lsub(e). Spectroscopic studies of the discharge close to the substrate surface show that the intensity of some arc and spark lines of titanium is also proportional to the deposition rate. Emission spectroscopy shows that hydrogen is produced and quickly pumped during the presputtering stage; its evacuation is necessary to obtain good metallic films. (author)

  15. Effect of sputtering power on structure and properties of Bi film deposited by DC magnetron sputtering

    International Nuclear Information System (INIS)

    Liao Guo; He Zhibing; Xu Hua; Li Jun; Chen Taihua; Chen Jiajun

    2012-01-01

    Bi film was fabricated at different sputtering powers by DC magnetron sputtering. The deposition rate of Bi film as the function of sputtering power was studied. The surface topography of Bi film was observed by SEM, and the growth mode of Bi film was investigated. The crystal structure was analyzed by XRD. The grain size and stress of Bi film were calculated. The SEM images show that all the films are columnar growth. The average grain size firstly increases as the sputtering power increases, then decreases at 60 W. The film becomes loose with the increase of sputtering power, while, the film gets compact when the sputtering power becomes from 45 to 60 W. The XRD results show that films are polycrystalline of hexagonal. And the stress transforms from the tensile stress to compressive stress as the sputtering power increases. (authors)

  16. Neutralizer Hollow Cathode Simulations and Comparisons with Ground Test Data

    Science.gov (United States)

    Mikellides, Ioannis G.; Snyder, John S.; Goebel, Dan M.; Katz, Ira; Herman, Daniel A.

    2009-01-01

    The fidelity of electric propulsion physics-based models depends largely on the validity of their predictions over a range of operating conditions and geometries. In general, increased complexity of the physics requires more extensive comparisons with laboratory data to identify the region(s) that lie outside the validity of the model assumptions and to quantify the uncertainties within its range of application. This paper presents numerical simulations of neutralizer hollow cathodes at various operating conditions and orifice sizes. The simulations were performed using a two-dimensional axisymmetric model that solves numerically a relatively extensive system of conservation laws for the partially ionized gas in these devices. A summary of the comparisons between simulation results and Langmuir probe measurements is provided. The model has also been employed to provide insight into recent ground test observations of the neutralizer cathode in NEXT. It is found that a likely cause of the observed keeper voltage drop is cathode orifice erosion. However, due to the small magnitude of this change, is approx. 0.5 V (less than 5% of the beginning-of-life value) over 10 khrs, and in light of the large uncertainties of the cathode material sputtering yield at low ion energies, other causes cannot be excluded. Preliminary simulations to understand transition to plume mode suggest that in the range of 3-5 sccm the existing 2-D model reproduces fairly well the rise of the keeper voltage in the NEXT neutralizer as observed in the laboratory. At lower flow rates the simulation produces oscillations in the keeper current and voltage that require prohibitively small time-steps to resolve with the existing algorithms.

  17. Electron emission from pseudospark cathodes

    International Nuclear Information System (INIS)

    Anders, A.; Anders, S.; Gundersen, M.A.

    1994-01-01

    The pseudospark cathode has the remarkable property of macroscopically homogeneous electron emission at very high current density (>1 kA/cm 2 ) over a large area (some cm 2 ). The model of electron emission presented here is based on the assumption that the pseudospark microscopically utilizes explosive arc processes, as distinct from earlier models of ''anomalous emission in superdense glow discharges.'' Explosive emission similar to vacuum are cathode spots occurs rapidly when the field strength is sufficiently high. The plasma remains macroscopically homogeneous since the virtual plasma anode adapts to the cathode morphology so that the current is carried by a large number of homogeneously distributed cathode spots which are similar to ''type 1'' and ''type 2'' spots of vacuum arc discharges. The net cathode erosion is greatly reduced relative to ''spark gap-type'' emission. At very high current levels, a transition to highly erosive spot types occurs, and this ''arcing'' leads to a significant reduction in device lifetime. Assuming vacuum-arc-like cathode spots, the observed current density and time constants can be easily explained. The observed cathode erosion rate and pattern, recent fast-camera data, laser-induced fluorescence, and spectroscopic measurements support this approach. A new hypothesis is presented explaining current quenching at relatively low currents. From the point of view of electron emission, the ''superdense glow'' or ''superemissive phase'' of pseudosparks represents an arc and not a glow discharge even if no filamentation or ''arcing'' is observed

  18. Arc-discharge and magnetron sputtering combined equipment for nanocomposite coating deposition

    International Nuclear Information System (INIS)

    Koval, N.N.; Borisov, D.P.; Savostikov, V.M.

    2005-01-01

    It is known that characteristics of nanocomposite coatings produced by reactive magnetron sputtering undergo an essential influence on the following parameters such as original component composition of targets being sputtered, as well as abundance ratio of such components in the coatings deposited, relative content of inert and reactionary gases in a gas mixture used and a value of operating pressure in a chamber, substrate temperature, and a value of substrate bias potential, determining energy of ionized atoms, ionized atoms flow density, i.e. ion current density on a substrate. The multifactor character of production process of nanocomposite coatings with certain physical and mechanical properties demands a purposeful and complex control on all above-mentioned parameters. To solve such a problem, an arc-discharge and magnetron sputtering combined equipment including a vacuum chamber of approximately ∼ 0.5 m 3 with a built-in low-pressure plasma generator made on the basis of non-self-sustained discharge with a thermal cathode and a planar magnetron combined with two sputtered targets has been created. Construction of such a complex set-up provides both an autonomous mode of operation and simultaneous operation of an arc plasma generator and magnetron sputtering system. Magnetron sputtering of either one or two targets simultaneously is provided as well. An arc plasma generator enables ions current density control on a substrate in a wide range due to discharge current varying from 1 to 100 A. Energy of ions is also being controlled in a wide range by a negative bias potential from 0 to 1000 V applied to a substrate. The wide control range of gas plasma density of a arc discharge of approximately 10 9 -10 11 cm -3 and high uniformity of its distribution over the total volume of an operating chamber (about 15% error with regard to the mean value) provides a purposeful and simultaneous control either of magnetron discharge characteristics (operating pressure of

  19. Sputtering calculations with the discrete ordinated method

    International Nuclear Information System (INIS)

    Hoffman, T.J.; Dodds, H.L. Jr.; Robinson, M.T.; Holmes, D.K.

    1977-01-01

    The purpose of this work is to investigate the applicability of the discrete ordinates (S/sub N/) method to light ion sputtering problems. In particular, the neutral particle discrete ordinates computer code, ANISN, was used to calculate sputtering yields. No modifications to this code were necessary to treat charged particle transport. However, a cross section processing code was written for the generation of multigroup cross sections; these cross sections include a modification to the total macroscopic cross section to account for electronic interactions and small-scattering-angle elastic interactions. The discrete ordinates approach enables calculation of the sputtering yield as functions of incident energy and angle and of many related quantities such as ion reflection coefficients, angular and energy distributions of sputtering particles, the behavior of beams penetrating thin foils, etc. The results of several sputtering problems as calculated with ANISN are presented

  20. Chemical sputtering of graphite by H+ ions

    International Nuclear Information System (INIS)

    Busharov, N.P.; Gorbatov, E.A.; Gusev, V.M.; Guseva, M.I.; Martynenko, Y.V.

    1976-01-01

    In a study of the sputtering coefficient S for the sputtering of graphite by 10-keV H + ions as a function of the graphite temperature during the bombardment, it is found that at T> or =750degreeC the coefficient S is independent of the target temperature and has an anomalously high value, S=0.085 atom/ion. The high rate of sputtering of graphite by atomic hydrogen ions is shown to be due to chemical sputtering of the graphite, resulting primarily in the formation of CH 4 molecules. At T=1100degreeC, S falls off by a factor of about 3. A model for the chemical sputtering of graphite is proposed

  1. Novel magnetic controlled plasma sputtering method

    International Nuclear Information System (INIS)

    Axelevich, A.; Rabinovich, E.; Golan, G.

    1996-01-01

    A novel method to improve thin film vacuum sputtering is presented. This method is capable of controlling the sputtering plasma via an external set of magnets, in a similar fashion to the tetrode sputtering method. The main advantage of the Magnetic Controlled Plasma Sputtering (MCPS) is its ability to independently control all deposition parameters without any interference or cross-talk. Deposition rate, using the MCPS, is found to be almost twice the rate of triode and tetrode sputtering techniques. Experimental results using the MCPS to deposit Ni layers are described. It was demonstrated that using the MCPS method the ion beam intensity at the target is a result of the interaction of a homogeneous external magnetic field and the controlling magnetic fields. The MCPS method was therefore found to be beneficial for the production of pure stoichiometric thin solid films with high reproducibility. This method could be used for the production of compound thin films as well. (authors)

  2. Low-Damage Sputter Deposition on Graphene

    Science.gov (United States)

    Chen, Ching-Tzu; Casu, Emanuele; Gajek, Marcin; Raoux, Simone

    2013-03-01

    Despite its versatility and prevalence in the microelectronics industry, sputter deposition has seen very limited applications for graphene-based electronics. We have systematically investigated the sputtering induced graphene defects and identified the reflected high-energy neutrals of the sputtering gas as the primary cause of damage. In this talk, we introduce a novel sputtering technique that is shown to dramatically reduce bombardment of the fast neutrals and improve the structural integrity of the underlying graphene layer. We also demonstrate that sputter deposition and in-situ oxidation of 1 nm Al film at elevated temperatures yields homogeneous, fully covered oxide films with r.m.s. roughness much less than 1 monolayer, which shows the potential of using such technique for gate oxides, tunnel barriers, and multilayer fabrication in a wide range of graphene devices.

  3. Measurements of beryllium sputtering yields at JET

    Science.gov (United States)

    Jet-Efda Contributors Stamp, M. F.; Krieger, K.; Brezinsek, S.

    2011-08-01

    The lifetime of the beryllium first wall in ITER will depend on erosion and redeposition processes. The physical sputtering yields for beryllium (both deuterium on beryllium (Be) and Be on Be) are of crucial importance since they drive the erosion process. Literature values of experimental sputtering yields show an order of magnitude variation so predictive modelling of ITER wall lifetimes has large uncertainty. We have reviewed the old beryllium yield experiments on JET and used current beryllium atomic data to produce revised beryllium sputtering yields. These experimental measurements have been compared with a simple physical sputtering model based on TRIM.SP beryllium yield data. Fair agreement is seen for beryllium yields from a clean beryllium limiter. However the yield on a beryllium divertor tile (with C/Be co-deposits) shows poor agreement at low electron temperatures indicating that the effect of the higher sputtering threshold for beryllium carbide is important.

  4. Research on an improved explosive emission cathode

    International Nuclear Information System (INIS)

    Liu Guozhi; Sun Jun; Shao Hao; Chen Changhua; Zhang Xiaowei

    2009-01-01

    This paper presents a physical description of the cathode plasma process of an explosive emission cathode (EEC) and experimental results on a type of oil-immersed graphite EEC. It is believed that the generation of a cathode plasma is mainly dependent on the state of the cathode surface, and that adsorbed gases and dielectrics on the cathode surface play a leading role in the formation of the cathode plasma. Based on these ideas, a type of oil-immersed graphite EEC is proposed and fabricated. The experiments indicate that the oil-immersed cathodes have improved emissive properties and longer lifetimes.

  5. Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

    International Nuclear Information System (INIS)

    Brenning, N; Huo, C; Raadu, M A; Lundin, D; Helmersson, U; Vitelaru, C; Stancu, G D; Minea, T

    2012-01-01

    The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared with direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target due to a substantial negative potential profile, sometimes called an extended presheath, from the location of ionization toward the cathode. Recent studies in HiPIMS devices, using floating-emitting and swept-Langmuir probes, show that such extended potential profiles do exist, and that the electric fields E z directed toward the target can be strong enough to seriously reduce ion transport to the substrate. However, they also show that the potential drops involved can vary by up to an order of magnitude from case to case. There is a clear need to understand the underlying mechanisms and identify the key discharge variables that can be used for minimizing the back-attraction. We here present a combined theoretical and experimental analysis of the problem of electric fields E z in the ionization region part of HiPIMS discharges, and their effect on the transport of ionized sputtered material. In particular, we have investigated the possibility of a ‘sweet spot’ in parameter space in which the back-attraction of ionized sputtered material is low. It is concluded that a sweet spot might possibly exist for some carefully optimized discharges, but probably in a rather narrow window of parameters. As a measure of how far a discharge is from such a window, a Townsend product Π Townsend is proposed. A parametric analysis of Π Townsend shows that the search for a sweet spot is complicated by the fact that contradictory demands appear for several of the externally controllable parameters such as high/low working gas pressure, short/long pulse length, high/low pulse power and high/low magnetic field strength. (paper)

  6. High-power sputtering employed for film deposition

    International Nuclear Information System (INIS)

    Shapovalov, V I

    2017-01-01

    The features of high-power magnetron sputtering employed for the films’ deposition are reviewed. The main physical phenomena accompanying high-power sputtering including ion-electron emission, gas rarefaction, ionization of sputtered atoms, self-sputtering, ion sound waves and the impact of the target heating are described. (paper)

  7. Ion beam sputter implantation method

    International Nuclear Information System (INIS)

    King, W.J.

    1978-01-01

    By means of ion beam atomizing or sputtering an integrally composed coating, the composition of which continuously changes from 100% of the substrate to 100% of the coating, can be surfaced on a substrate (e.g. molten quartz on plastic lenses). In order to do this in the facility there is directed a primary beam of accelerated noble gas ions on a target from the group of the following materials: SiO 2 , Al 2 O 3 , Corning Glass 7070, Corning Glass 7740 or borosilicate glass. The particles leaving the target are directed on the substrate by means of an acceleration potential of up to 10 KV. There may, however, be coated also metal layers (Ni, Co) on a mylar film resulting in a semireflecting metal film. (RW) [de

  8. Implantation, recoil implantation, and sputtering

    International Nuclear Information System (INIS)

    Kelly, R.

    1984-01-01

    Underlying ion-beam modification of surfaces is the more basic subject of particle-surface interaction. The ideas can be grouped into forward and backward features, i.e. those affecting the interior of the target and those leading to particle expulsion. Forward effects include the stopping of the incident particles and the deposition of energy, both governed by integral equations which are easily set up but difficult to solve. Closely related is recoil implantation where emphasis is placed not on the stopping of the incident particles but on their interaction with target atoms with resulting implantation of these atoms. Backward effects, all of which are denoted as sputtering, are in general either of collisional, thermal, electronic, or exfoliational origin. (Auth.)

  9. Effects of ion sputtering on semiconductor surfaces

    International Nuclear Information System (INIS)

    McGuire, G.E.

    1978-01-01

    Ion beam sputtering has been combined with Auger spectroscopy to study the effects of ion beams on semiconductor surfaces. Observations on the mass dependence of ion selective sputtering of two component systems are presented. The effects of ion implantation are explained in terms of atomic dilution. Experimental data are presented that illustrate the super-position of selective sputtering and implantation effects on the surface composition. Sample reduction from electron and ion beam interaction is illustrated. Apparent sample changes which one might observe from the effects of residual gas contamination and electric fields are also discussed. (Auth.)

  10. Variables affecting simulated Be sputtering yields

    Energy Technology Data Exchange (ETDEWEB)

    Björkas, C., E-mail: carolina.bjorkas@helsinki.fi; Nordlund, K.

    2013-08-15

    Since beryllium is a strong candidate for the main plasma-facing material in future fusion reactors, its sputtering behaviour plays an important role in predicting the reactor’s life-time. Consensus about the actual sputtering yields has not yet been achieved, as observations are influenced by experimental method and/or studied sample. In this work, the beryllium sputtering due to deuterium and beryllium self-bombardment is analyzed using molecular dynamics simulations. The main methodological aspects that influence the outcome, such as flux and fluence of the bombardment, are highlighted, and it is shown that the simulated yields also depend on the sample structure and deuterium content.

  11. Sensitivity and stability of sputtered sandwich photocells

    International Nuclear Information System (INIS)

    Murray, H.; Piel, A.

    1979-01-01

    The physical parameters of sputtered Metal-Semiconductor-Metal photocells are described in view of solar energy conversion. Specific properties of sputtered films lead to a particular stability of physical parameters such as dark conduction, capacitance and dielectric losses. Interband transitions occur when the photon energy is larger than the bandgap of the photoconductor. The transport of photo-excited carriers in the built-in electric field involves the existence of a photovoltaic effect. The influence of sputtering on the specific properties of solar energy conversion is discussed. (author)

  12. Modeling and analysis of surface roughness effects on sputtering, reflection, and sputtered particle transport

    International Nuclear Information System (INIS)

    Brooks, J.N.; Ruzic, D.N.

    1990-01-01

    The microstructure of the redeposited surface in tokamaks may affect sputtering and reflection properties and subsequent particle transport. This subject has been studied numerically using coupled models/codes for near-surface plasma particle kinetic transport (WBC code) and rough surface sputtering (fractal-TRIM). The coupled codes provide an overall Monte Carlo calculation of the sputtering cascade resulting from an initial flux of hydrogen ions. Beryllium, carbon, and tungsten surfaces are analyzed for typical high recycling, oblique magnetic field, divertor conditions. Significant variations in computed sputtering rates are found with surface roughness. Beryllium exhibits high D-T and self-sputtering coefficients for the plasma regime studied (T e = 30-75 eV). Carbon and tungsten sputtering is significantly lower. 9 refs., 6 figs., 1 tab

  13. Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System

    Directory of Open Access Journals (Sweden)

    P. Balashabadi

    2013-12-01

    Full Text Available A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working gas = Pure argon, Working pressure = 1 Pa, Cathode current = 8 A and cathode voltage = -600 V .Microstructure of the film was investigated by X-Ray Diffraction and the scanning electron microscopy analyses. The elements profile was determined by glow discharge–optical emission spectroscopy analysis. During deposition, both targets with magnetron configuration were sputtered simultaneously by argon ions. A Plasma column on the targets surface was generated by a 290 G permanent magnet unit. Two DC power supply units with three phases input and maximum output of 12 A/1000V were used to deposit the multilayer thin films. A control phase system was used to adjust output voltage.

  14. Alkali metal adsorbate sputtering by molecular impact

    International Nuclear Information System (INIS)

    Moran, J.P.; Wachman, H.Y.; Trilling, L.

    1974-01-01

    An exploratory study of the sputtering by a krypton molecular beam of rubidium adsorbed at low coverage on a tungsten substrate has been described in a previous paper. An extension of this work is reported now

  15. Electrical resistivity of sputtered molybdenum films

    International Nuclear Information System (INIS)

    Nagano, J.

    1980-01-01

    The electrical resistivity of r.f. sputtered molybdenum films of thickness 5-150 nm deposited on oxidized silicon substrates was resolved into the three electron scattering components: isotropic background scattering, scattering at grain boundaries and scattering at surfaces. It was concluded that the isotropic background scattering is almost equal to that of bulk molybdenum and is not influenced by sputtering and annealing conditions. When the film thickness is sufficient that surface scattering can be ignored, the decrease in film resistivity after annealing is caused by the decrease in scattering at the grain boundaries for zero bias sputtered films, and is caused by an increase of the grain diameter for r.f. bias sputtered films. (Auth.)

  16. Large Area Sputter Coating on Glass

    Science.gov (United States)

    Katayama, Yoshihito

    Large glass has been used for commercial buildings, housings and vehicles for many years. Glass size for flat displays is getting larger and larger. The glass for the 8th generation is more than 5 m2 in area. Demand of the large glass is increasing not only in these markets but also in a solar cell market growing drastically. Therefore, large area coating is demanded to plus something else on glass more than ever. Sputtering and pyrolysis are the major coating methods on large glass today. Sputtering process is particularly popular because it can deposit a wide variety of materials in good coating uniformity on the glass. This paper describes typical industrial sputtering system and recent progress in sputtering technology. It also shows typical coated glass products in architectural, automotive and display fields and comments on their functions, film stacks and so on.

  17. Electron emission mechanism of carbon fiber cathode

    International Nuclear Information System (INIS)

    Liu Lie; Li Limin; Wen Jianchun; Wan Hong

    2005-01-01

    Models of electron emission mechanism are established concerning metal and carbon fiber cathodes. Correctness of the electron emission mechanism was proved according to micro-photos and electron scanning photos of cathodes respectively. The experimental results and analysis show that the surface flashover induces the electron emission of carbon fiber cathode and there are electron emission phenomena from the top of the carbon and also from its side surface. In addition, compared with the case of the stainless steel cathode, the plasma expansion velocity for the carbon fiber cathode is slower and the pulse duration of output microwave can be widened by using the carbon fiber cathode. (authors)

  18. Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering

    CERN Document Server

    Seino, T

    2002-01-01

    The reactive pulsed dc sputtering technique is widely used for the deposition of oxide films. The operating pressure for sputtering is commonly above 0.13 Pa. In this study, however, aluminum oxide (alumina) films were deposited at operating pressures from 0.06 to 0.4 Pa using a sputtering system equipped with a scanning magnetron cathode and a pulsed dc power supply. The pulsed dc power was found to be useful not only to reduce arcing, but also to sustain the discharge at low pressure. The electrical breakdown field, intrinsic stress, O/Al ratio, refractive index, and surface roughness were investigated. Both a low intrinsic stress and an O/Al ratio around the stoichiometry were required to get the film having a high breakdown field. A low operating pressure of 0.1 Pa was found to provide the necessary stress and O/Al ratio targets. A 50-nm-thick alumina film having a maximum breakdown field of 7.4 MV/cm was obtained.

  19. Spatial distributions of Cu polycrystal sputtered atoms

    International Nuclear Information System (INIS)

    Abgaryan, V.K.; Semenov, A.A.; Shkarban, I.I.

    2004-01-01

    The results of the experimental determination of the Cu atoms spatial distribution, sputtered from the polycrystalline copper target, irradiated by the Xe + ions with the energy of 300 eV, are presented. The spatial distributions of the sputtered particles, calculated through the quasistable-dynamic model of the cascade modeling (CAMO) are presented also for the case of the polycrystalline copper irradiation by the Ar + and Xe + ions with the energy of 300-1000 eV [ru

  20. Sputtering of sodium on the planet Mercury

    Science.gov (United States)

    Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.

    1986-01-01

    It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.

  1. Heavy particle transport in sputtering systems

    Science.gov (United States)

    Trieschmann, Jan

    2015-09-01

    This contribution aims to discuss the theoretical background of heavy particle transport in plasma sputtering systems such as direct current magnetron sputtering (dcMS), high power impulse magnetron sputtering (HiPIMS), or multi frequency capacitively coupled plasmas (MFCCP). Due to inherently low process pressures below one Pa only kinetic simulation models are suitable. In this work a model appropriate for the description of the transport of film forming particles sputtered of a target material has been devised within the frame of the OpenFOAM software (specifically dsmcFoam). The three dimensional model comprises of ejection of sputtered particles into the reactor chamber, their collisional transport through the volume, as well as deposition of the latter onto the surrounding surfaces (i.e. substrates, walls). An angular dependent Thompson energy distribution fitted to results from Monte-Carlo simulations is assumed initially. Binary collisions are treated via the M1 collision model, a modified variable hard sphere (VHS) model. The dynamics of sputtered and background gas species can be resolved self-consistently following the direct simulation Monte-Carlo (DSMC) approach or, whenever possible, simplified based on the test particle method (TPM) with the assumption of a constant, non-stationary background at a given temperature. At the example of an MFCCP research reactor the transport of sputtered aluminum is specifically discussed. For the peculiar configuration and under typical process conditions with argon as process gas the transport of aluminum sputtered of a circular target is shown to be governed by a one dimensional interaction of the imposed and backscattered particle fluxes. The results are analyzed and discussed on the basis of the obtained velocity distribution functions (VDF). This work is supported by the German Research Foundation (DFG) in the frame of the Collaborative Research Centre TRR 87.

  2. MD simulation of cluster formation during sputtering

    International Nuclear Information System (INIS)

    Muramoto, T.; Okai, M.; Yamashita, Y.; Yorizane, K.; Yamamura, Y.

    2001-01-01

    The cluster ejection due to cluster impact on a solid surface is studied through molecular dynamics (MD) simulations. Simulations are performed for Cu cluster impacts on the Cu(1 1 1) surface for cluster energy 100 eV/atom, and for clusters of 6, 13, 28 and 55 atoms. Interatomic interactions are described by the AMLJ-EAM potential. The vibration energy spectrum is independent of the incident cluster size and energy. This comes from the fact that sputtered clusters become stable through the successive fragmentation of nascent large sputtered clusters. The vibration energy spectra for large sputtered clusters have a peak, whose energy corresponds to the melting temperature of Cu. The exponent of the power-law fit of the abundance distribution and the total sputtering yield for the cluster impacts are higher than that for the monatomic ion impacts with the same total energy, where the exponent δ is given by Y n ∝n δ and Y n is the yield of sputtered n-atom cluster. The exponent δ follows a unified function of the total sputtering yield, which is a monotonic increase function, and it is nearly equal to δ ∼ -3 for larger yield

  3. Sputtering on cobalt with noble gas ions

    International Nuclear Information System (INIS)

    Sarholt-Kristensen, L.; Johansen, A.; Johnson, E.

    1983-01-01

    Single crystals of cobalt have been bombarded with 80 keV Ar + ions and with 80 keV and 200 keV Xe + ions in the [0001] direction of the hcp phase and the [111] direction of the fcc phase. The sputtering yield has been measured as function of target temperature (20 0 C-500 0 C), showing a reduction in sputtering yield for 80 keV Ar + ions and 200 keV Xe + ions, when the crystal structure changes from hcp to fcc. In contrast to this, bombardment with 80 keV Xe + ions results in an increase in sputtering yield as the phase transition is passed. Sputtering yields for [111] nickel are in agreement with the sputtering yields for fcc cobalt indicating normal behaviour of the fcc cobalt phase. The higher sputtering yield of [0001] cobalt for certain combinations of ion mass and energy may then be ascribed to disorder induced partly by martensitic phase transformation, partly by radiation damage. (orig.)

  4. Sputtering graphite coating to improve the elevated-temperature cycling ability of the LiMn2O4 electrode.

    Science.gov (United States)

    Wang, Jiexi; Zhang, Qiaobao; Li, Xinhai; Wang, Zhixing; Guo, Huajun; Xu, Daguo; Zhang, Kaili

    2014-08-14

    To improve the cycle performance of LiMn2O4 at elevated temperature, a graphite layer is introduced to directly cover the surface of a commercial LiMn2O4-based electrode via room-temperature DC magnetron sputtering. The as-modified cathodes display improved capacity retention as compared to the bare LiMn2O4 cathode (BLMO) at 55 °C. When sputtering graphite for 30 min, the sample shows the best cycling performance at 55 °C, maintaining 96.2% capacity retention after 200 cycles. Reasons with respect to the graphite layer for improving the elevated-temperature performance of LiMn2O4 are systematically investigated via the methods of cyclic voltammetry, electrochemical impedance spectroscopy, X-ray photoelectron spectrometry, scanning and transmission electron microscopy, X-ray diffraction and inductively coupled plasma-atomic emission spectrometry. The results demonstrate that the graphite coated LiMn2O4 cathode has much less increased electrode polarization and electrochemical impedance than BLMO during the elevated-temperature cycling process. Furthermore, the graphite layer is able to alleviate the severe dissolution of manganese ions into the electrolyte and mitigate the morphological and structural degradation of LiMn2O4 during cycling. A model for the electrochemical kinetics process is also suggested for explaining the roles of the graphite layer in suppressing the Mn dissolution.

  5. FY1995 study to create the high density magnetic recording devices by using an ultra clean sputtering process; 1995 nendo choseijo sputter process ni yoru chokomitsudo jiki kiroku device no sosei

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-03-01

    It is important to control microstructure of thin film magnetic devices such as recording heads and media, in order to induce excellent magnetic properties. Since the impurities in the sputtering atmosphere is easily thought to affect strongly on the initial film growth, we will develop the highly purified sputtering atmosphere to establish a fabrication technology of ultra thin metallic films with desirable microstructure. A specialized multi-sputtering system which has extremely clean atmosphere (impurity level: 1/10000 compared to conventional systems) were realized by (a) decreasing out-gassing rate from vacuum chamber, pumping system, cathode, robot, etc. and (b) using ultra-clean processing gas. The base pressure was 8 x 10{sup -12} Torr (XHV) and the build-up rate was less than 1 x 10{sup -8} Torrl/sec. From the correlation between the microstructure and magnetic properties of a part of spin-valve GMR films, the guiding principle for the microstructural design were clarified to induce the exchange coupling effectively at the ferro/antiferromagnetic interface and to enhance the GMR effect at the magnetic/non-magnetic interface. The mechanism of' Cr segregation on the grain boundaries was clarified, in thin film media deposited under ultra clean sputtering process. The material specification of the magnetic ultra thin film media for high density recording with low media noise were designed from view of the thermal agitation. (NEDO)

  6. Plasma Deposition of Oxide-Coated Cathodes

    National Research Council Canada - National Science Library

    Umstattd, Ryan

    1998-01-01

    ...; such cathodes may also have applicability for lower current density continuous wave devices. This novel approach to manufacturing an oxide cathode eliminates the binders that may subsequently (and unpredictably...

  7. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    International Nuclear Information System (INIS)

    Vasina, P; Hytkova, T; Elias, M

    2009-01-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  8. Mechanistic Enhancement of SOFC Cathode Durability

    Energy Technology Data Exchange (ETDEWEB)

    Wachsman, Eric [Univ. of Maryland, College Park, MD (United States)

    2016-02-01

    Durability of solid oxide fuel cells (SOFC) under “real world” conditions is an issue for commercial deployment. In particular cathode exposure to moisture, CO2, Cr vapor (from interconnects and BOP), and particulates results in long-term performance degradation issues. Here, we have conducted a multi-faceted fundamental investigation of the effect of these contaminants on cathode performance degradation mechanisms in order to establish cathode composition/structures and operational conditions to enhance cathode durability.

  9. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  10. UHV-compatible sputtering additive for surface physics examination of large area HTSL/isolator thin film. Final report

    International Nuclear Information System (INIS)

    Koch, H.; Beyer, J.; Knappe, S.; Ludwig, F.; Menkel, S.; Quan, Z.; Schurig, T.

    1996-06-01

    In the course of the project, a manufacturing technique for the production of cryo-electronic high temperature superconductor (HTSL) components is to be developed, which includes the thin film separation process and the structuring technique. A special sputtering process using a linear hollow cathode is to be applied as the thin film separation process for the HTSL YBa 2 Cu 3 O 7-δ . The sputtering plant which was to be built up by the UHV method in advance, should be connected to an existing UHV multi-chamber plant for the manufacture and surface analysis of thin films, in order to be able to connect precise reproducible sample production conditions with a controlled sample transfer and informative in-situ analysis. (orig./MM) [de

  11. Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

    Directory of Open Access Journals (Sweden)

    Claudiu V. Falub

    2017-05-01

    Full Text Available Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system. A typical multilayer consists of a bilayer stack up to 50 periods, with alternating (50-100 nm thick magnetic layers and (2-20 nm thick dielectric interlayers. We introduced the in-plane magnetic anisotropy in these films during sputtering by a combination of a linear magnetic field, seed layer texturing by means of linear collimators, and the oblique incidence inherent to the geometry of the sputter system. Depending on the magnetic material, the anisotropy field for these films was tuned in the range of ∼(7-120 Oe by choosing the appropriate interlayer thickness, the aspect ratios of the linear collimators in front of the targets, and the sputter process parameters (e.g. pressure, power, DC pulse frequency, while the coercivity was kept low, ∼(0.05-0.9 Oe. The alignment of the easy axis (EA on the 8” wafers was typically between ±1.5° and ±4°. We discuss the interdependence of structure and magnetic properties in these films, as revealed by atomic force microscopy (AFM, X-ray reflectivity (XRR with reciprocal space mapping (RSM and magneto-optical Kerr effect (MOKE measurements.

  12. Spatial survey of a magnetron plasma sputtering system using a Langmuir probe

    International Nuclear Information System (INIS)

    Field, D.J.; Dew, S.K.; Burrell, R.E.

    2002-01-01

    A two-dimensional spatial survey is conducted for a magnetron sputtering plasma at two pressures (40 and 5 mTorr) using a Langmuir probe. The plasma density is found to be highest (up to 6.0x10 10 cm -3 ) above the etch region of the cathode, near the magnetic trap. The density drops between the etch regions, near the edges of the cathode and also at distances farther away from the cathode. The floating potential was found to be most negative (down to -12 V) in regions where the highest electron temperatures were observed (up to almost 4 eV) and became less negative (near 0 V) in regions where the electron temperature was lowest (less than 0.5 eV). This complementary trend was consistent in all spatial locations and at both pressures. The plasma potential was found to have very weak dependence, if any, on spatial location and pressure. The relationship between electron transport processes, collision processes and electron temperatures is discussed. Electron energy distribution functions were found to be either Maxwellian or bi-Maxwellian in nature, depending on pressure and spatial location. Maxwellian distributions were found near the magnetic trap or source of the plasma. Bi-Maxwellian distributions were found further away from the source, and it appears they result from Maxwellian distributions bifurcating as they diffuse away from the source. The suitability of the popular models for this bifurcation is discussed

  13. The pumping of hydrogen and helium by sputter-ion pumps

    International Nuclear Information System (INIS)

    Welch, K.M.; Pate, D.J.; Todd, R.J.

    1992-01-01

    The pumping of hydrogen in diode and triode sputter-ion pumps is discussed. The type of cathode material used in these pumps is shown to have a significant impact on the effectiveness with which hydrogen is pumped. Examples of this include data for pumps with aluminum and titanium-alloy cathodes. Diode pumps with aluminum cathodes are shown to be no more effective in the pumping of hydrogen than in the pumping of helium. The use of titanium or titanium alloy anodes is also shown to measurably impact on the speed of these pumps at.very low pressures. This stems from the fact that hydrogen is x10 6 more soluble in titanium than in stainless steel. Hydrogen becomes resident in the anodes because of fast neutral burial. Lastly, quantitative data are given for the He speeds and capacities of both noble and conventional diode and triode pumps. The effectiveness of various pump regeneration procedures, subsequent to the pumping of He, is reported.These included bakeout and N 2 glow discharge cleaning. The comparative desorption of He with the subsequent pumping of N 2 is reported on. The N 2 speed of these pumps was used as the benchmark for defining the size of the pumps vs. their respective He speeds

  14. System of two-coordinate cylindrical proportional chambers with resistive cathode

    International Nuclear Information System (INIS)

    Golubev, V.B.; Peryshkin, A.N.; Red'ko, I.Yu.; Serednyakov, S.I.

    1981-01-01

    A system of two-coordinate cylindrical proportional chambers is developed for experiments on studying the e + e - annihilation. The system consists of 6 independent proportional chambers of semicylindrical configuration with a gap between anode and cathode equal to 5 mm. The diameter of an external chnsamber equals 25 cm and its length cotitutes 40 cm. Anode wires 20 μm in-diameter are fixed in parallel to the system axis with a pitch of 2-3 mm. The use of a resisti ve cothode permitting to maintain the anode wires and delay circuits under the ground potential is one of the specific feabures of the given chamber. The resistive layer is produced by sputtering the aquadag aqueous suspension with the polyvinylacetate emulsion on a fibregrass-textolite. 8 delay circuits is mounted outside of each chamber from the side of the cathode. A functional flowsheet of a data readout system is given. The track angte is determined directiy according to the numbers of operated wires; coordinates along the axis are determined by means of the delay circuits placed outside the chamber near the resistive cathode. The accuracy of the coordinate measurement in both directions constitutes about 1 mm. Each chamber permits to measure the coordinates of several particles, if they entry into different delay circuits. The proportional chambers are filled with the mixture of Ar+30%CO 2 . Anode and cathode efficiencies in the plateau region (150-250) exceed 99%

  15. Multi-sided metallization of textile fibres by using magnetron system with grounded cathode

    Directory of Open Access Journals (Sweden)

    Chodun Rafał

    2017-10-01

    Full Text Available The synthesis of coatings on textiles fibers enables functionalization of their properties e.g.: changing the reaction on IR radiation. In our experiment, a magnetron with a grounded cathode and positively biased anode was used as a source of plasma. A ring anode was positioned at 8 cm distance from the cathode. Samples of glass and cotton textile were placed at the plane of the anode. Ti and TiN coatings were deposited by sputtering of titanium target in Ar or Ar+ N2 atmosphere. SEM studies showed that, using the magnetron system described above, the textile fibers were covered by the 2 μm to 3 μm thick coatings. Unexpectedly, the coatings were deposited at both sides of the samples: the front side was exposed to glow discharge plasma and the backside was completely shaded from the plasma. IR optical investigation exhibited significant change in reflectance and transmittance of the coated textiles. The using of standard magnetron system (grounded anode and cathode at negative potential resulted in a coating deposition at the textile side exposed to the plasma action only. We believe that the multi-sided deposition of coatings observed during the process run with magnetron with grounded cathode is a result of an ambipolar diffusion mechanism in the anodic potential drop region.

  16. Computer simulation of sputtering: A review

    International Nuclear Information System (INIS)

    Robinson, M.T.; Hou, M.

    1992-08-01

    In 1986, H. H. Andersen reviewed attempts to understand sputtering by computer simulation and identified several areas where further research was needed: potential energy functions for molecular dynamics (MD) modelling; the role of inelastic effects on sputtering, especially near the target surface; the modelling of surface binding in models based on the binary collision approximation (BCA); aspects of cluster emission in MD models; and angular distributions of sputtered particles. To these may be added kinetic energy distributions of sputtered particles and the relationships between MD and BCA models, as well as the development of intermediate models. Many of these topics are discussed. Recent advances in BCA modelling include the explicit evaluation of the time in strict BCA codes and the development of intermediate codes able to simulate certain many-particle problems realistically. Developments in MD modelling include the wide-spread use of many-body potentials in sputtering calculations, inclusion of realistic electron excitation and electron-phonon interactions, and several studies of cluster ion impacts on solid surfaces

  17. Sputtering properties of tungsten 'fuzzy' surfaces

    International Nuclear Information System (INIS)

    Nishijima, D.; Baldwin, M.J.; Doerner, R.P.; Yu, J.H.

    2011-01-01

    Sputtering yields of He-induced W 'fuzzy' surfaces bombarded by Ar have been measured in the linear divertor plasma simulator PISCES-B. It is found that the sputtering yield of a fuzzy surface, Y fuzzy , decreases with increasing fuzzy layer thickness, L, and saturates at ∼10% of that of a smooth surface, Y smooth , at L > 1 μm. The reduction in the sputtering yield is suspected to be due mainly to the porous structure of fuzz, since the ratio, Y fuzzy /Y smooth follows (1 - p fuzz ), where p fuzz is the fuzz porosity. Further, Y fuzzy /Y smooth is observed to increase with incident ion energy, E i . This may be explained by an energy dependent change in the angular distribution of sputtered W atoms, since at lower E i , the angular distribution is observed to become more butterfly-shaped. That is, a larger fraction of sputtered W atoms can line-of-sight deposit/stick onto neighboring fuzz nanostructures for lower E i butterfly distributions, resulting in lower ratio of Y fuzzy /Y smooth .

  18. Physical sputtering of metallic systems by charged-particle impact

    International Nuclear Information System (INIS)

    Lam, N.Q.

    1989-12-01

    The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs

  19. Quantitative sputter profiling at surfaces and interfaces

    International Nuclear Information System (INIS)

    Kirschner, J.; Etzkorn, H.W.

    1981-01-01

    The key problem in quantitative sputter profiling, that of a sliding depth scale has been solved by combined Auger/X-ray microanalysis. By means of this technique and for the model system Ge/Si (amorphous) the following questions are treated quantitatively: shape of the sputter profiles when sputtering through an interface and origin of their asymmetry; precise location of the interface plane on the depth profile; broadening effects due to limited depth of information and their correction; origin and amount of bombardment induced broadening for different primary ions and energies; depth dependence of the broadening, and basic limits to depth resolution. Comparisons are made to recent theoretical calculations based on recoil mixing in the collision cascade and very good agreement is found

  20. Sputtering and mixing of supported nanoparticles

    International Nuclear Information System (INIS)

    Jiménez-Sáez, J.C.; Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J.

    2013-01-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed

  1. Sputtering as a means of depth profiling

    International Nuclear Information System (INIS)

    Whitton, J.L.

    1978-01-01

    Probably the most common technique for determination of depth profiles by sputtering is that of secondary ion mass spectrometry. Many problems occur in the important step of converting the time (of sputtering) scale to a depth scale and these problems arise before the secondary ions are ejected. An attempt is made to present a comprehensive list of the effects that should be taken into consideration in the use of sputtering as a means of depth profiling. The various parameters liable to affect the depth profile measurements are listed in four sections: beam conditions; target conditions; experimental environment; and beam-target interactions. The effects are discussed and where interplay occurs, cross-reference is made and examples are provided where possible. (B.R.H.)

  2. Synopsis of Cathode No.4 Activation

    International Nuclear Information System (INIS)

    Kwan, Joe; Ekdahl, C.; Harrison, J.; Kwan, J.; Leitner, M.; McCruistian, T.; Mitchell, R.; Prichard, B.; Roy, P.

    2006-01-01

    The purpose of this report is to describe the activation of the fourth cathode installed in the DARHT-II Injector. Appendices have been used so that an extensive amount of data could be included without danger of obscuring important information contained in the body of the report. The cathode was a 612 M type cathode purchased from Spectra-Mat. Section II describes the handling and installation of the cathode. Section III is a narrative of the activation based on information located in the Control Room Log Book supplemented with time plots of pertinent operating parameters. Activation of the cathode was performed in accordance with the procedure listed in Appendix A. The following sections provide more details on the total pressure and constituent partial pressures in the vacuum vessel, cathode heater power/filament current, and cathode temperature

  3. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson; Fatih Dogan; Vladimir Petrovsky

    2002-03-31

    This project has three main goals: Thin Films Studies, Preparation of Graded Porous Substrates and Basic Electrical Characterization and testing of Planar Single Cells. This period has continued to address the problem of making dense 1/2 to 5 {micro}m thick dense layers on porous substrates (the cathode LSM). Our current status is that we are making structures of 2-5 cm{sup 2} in area, which consist of either dense YSZ or CGO infiltrated into a 2-5 {micro}m thick 50% porous layer made of either nanoncrystalline CGO or YSZ powder. This composite structure coats a macroporous cathode or anode; which serves as the structural element of the bi-layer structure. These structures are being tested as SOFC elements. A number of structures have been evaluated both as symmetrical and as button cell configuration. Results of this testing indicates that the cathodes contribute the most to cell losses for temperatures below 750 C. In this investigation different cathode materials were studied using impedance spectroscopy of symmetric cells and IV characteristics of anode supported fuel cells. Cathode materials studied included La{sub 0.8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (LSCF), La{sub 0.7}Sr{sub 0.2}MnO{sub 3} (LSM), Pr{sub 0.8}Sr{sub 0.2}Fe{sub 0.8}O{sub 3} (PSCF), Sm{sub 0.8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (SSCF), and Yb{sub .8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (SSCF). A new technique for filtering the Fourier transform of impedance data was used to increase the sensitivity of impedance analysis. By creating a filter specifically for impedance spectroscopy the resolution was increased. The filter was tailored to look for specific circuit elements like R//C, Warburg, or constant phase elements. As many as four peaks can be resolved using the filtering technique on symmetric cells. It may be possible to relate the different peaks to material parameters, like the oxygen exchange coefficient. The cathode grouped in order from lowest to highest ASR is

  4. Sputtering yield calculation for binary target

    International Nuclear Information System (INIS)

    Jimenez-Rodriguez, J.J.; Rodriguez-Vidal, M.; Valles-Abarca, J.A.

    1979-01-01

    The generalization for binary targets, of the ideas proposed by Sigmund for monoatomic targets, leads to a set of coupled intergrodifferential equations for the sputtering functions. After moment decomposition, the final formulae are obtained by the standard method based on the Laplace Transform, where the inverse transform is made with the aid of asymptotic expansions in the limit of very high projectile energy as compared to the surface binding energy. The possible loss of stoichiometry for binary targets is analyzed. Comparison of computed values of sputtering yield for normal incidence, with experimental results shows good agreement. (author)

  5. Photonometers for coating and sputtering machines

    Directory of Open Access Journals (Sweden)

    Václavík J.

    2013-05-01

    Full Text Available The concept of photonometers (alternative name of optical monitor of a vacuum deposition process for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.

  6. Photonometers for coating and sputtering machines

    Science.gov (United States)

    Oupický, P.; Jareš, D.; Václavík, J.; Vápenka, D.

    2013-04-01

    The concept of photonometers (alternative name of optical monitor of a vacuum deposition process) for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR) for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.

  7. Dependence of sputtering coefficient on ion dose

    International Nuclear Information System (INIS)

    Colligon, J.S.; Patel, M.H.

    1977-01-01

    The sputtering coefficient of polycrystalline gold bombarded by 10-40 keV Ar + ions had been measured as a function of total ion dose and shown to exhibit oscillations in magnitude between 30 and 100%. Possible experimental errors which would give rise to such an oscillation have been considered, but it is apparent that these factors are unable to explain the measurements. It is proposed that a change in the Sublimation Energy associated with either bulk damage or formation of surface topographical features arising during ion bombardment may be responsible for the observed variations in sputtering coefficient. (author)

  8. Thick CrN/NbN multilayer coating deposited by cathodic arc technique

    Energy Technology Data Exchange (ETDEWEB)

    Araujo, Juliano Avelar; Tschiptschin, Andre Paulo; Souza, Roberto Martins, E-mail: antschip@usp.br [Universidade de Sao Paulo (USP), SP (Brazil); Lima, Nelson Batista de [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil)

    2017-01-15

    The production of tribological nanoscale multilayer CrN/NbN coatings up to 6 μm thick by Sputtering/HIPIMS has been reported in literature. However, high demanding applications, such as internal combustion engine parts, need thicker coatings (>30 μm). The production of such parts by sputtering would be economically restrictive due to low deposition rates. In this work, nanoscale multilayer CrN/NbN coatings were produced in a high-deposition rate, industrial-size, Cathodic Arc Physical Vapor Deposition (ARC-PVD) chamber, containing three cathodes in alternate positions (Cr/ Nb/Cr). Four 30 μm thick NbN/CrN multilayer coatings with different periodicities (20, 10, 7.5 and 4 nm) were produced. The coatings were characterized by X-Ray Diffraction (XRD) and Transmission Electron Microscopy (TEM). The multilayer coating system was composed of alternate cubic rock salt CrN and NbN layers, coherently strained due to lattice mismatch. The film grew with columnar morphology through the entire stratified structure. The periodicities adopted were maintained throughout the entire coating. The 20 nm periodicity coating showed separate NbN and CrN peaks in the XRD patterns, while for the lower periodicity (≤10nm) coatings, just one intermediate lattice (d-spacing) was detected. An almost linear increase of hardness with decreasing bilayer period indicates that interfacial effects can dominate the hardening mechanisms. (author)

  9. Conical nano-structure arrays of Platinum cathode catalyst for enhanced cell performance in PEMFC (proton exchange membrane fuel cell)

    International Nuclear Information System (INIS)

    Khan, Aziz; Nath, Bhabesh Kumar; Chutia, Joyanti

    2015-01-01

    Conical nanostructure arrays of Pt (Platinum) as cathode catalyst are developed using a novel integrated plasma sputtering technique. The integration method involves successive deposition of Pt catalyst arrays one upon another maintaining a uniform time gap. Deposition by integrated approach results in the formation of dense arrays of Pt nanostructure as compared to continuous deposition. These high number density integrated arrays with low Pt loading of 0.10 mg cm −2 at the cathode provide enhanced performance compared to non-integrated cathode catalyst prepared by continuous deposition and standard commercial electrodes with Pt loadings of 1 mg cm −2 . The performance is compared on the basis of polarization curve measurements and the calculated power density values. PEM fuel cell with dual integrated cathode showed an improved power density of 0.90 W cm −2 , which is higher than continuously deposited cathode catalyst with maximum power density of 0.67 W cm −2 for the same Pt loading of 0.10 mg cm −2 . - Highlights: • Conical nanostructures with high number density are prepared by a novel integrated deposition technique. • Electrode with such catalyst shows maximum performance of 0.9 W cm −2 . • Integrated catalyst performs better than continuously prepared nanostructure catalyst.

  10. KRYPTON INCORPORATION IN SPUTTERED SILICON FILMS

    NARCIS (Netherlands)

    GREUTER, MJW; NIESEN, L; HAKVOORT, RA; DEROODE, J; VANVEEN, A; BERNTSEN, AJM; SLOOF, WG

    1993-01-01

    The incorporation of Kr in sputtered a-Si films has been investigated in a systematic way by varying the Kr to Si flux, yielding Kr concentrations up to 5 at %. Compositions were determined with X-ray microanalysis. A model has been applied to describe the composition of the growing film. The layers

  11. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.

    1992-01-01

    were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...

  12. Pulsed dc self-sustained magnetron sputtering

    International Nuclear Information System (INIS)

    Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.

    2008-01-01

    The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition

  13. Electron beam generation form a superemissive cathode

    International Nuclear Information System (INIS)

    Hsu, T.-Y.; Liou, R.-L.; Kirkman-Amemiya, G.; Gundersen, M.A.

    1991-01-01

    An experimental study of electron beams produced by a superemissive cathode in the Back-Lighted Thyratron (BLT) and the pseudospark is presented. This work is motivated by experiments demonstrating very high current densities (≥10 kA/cm 2 over an area of 1 cm 2 ) from the pseudospark and BLT cathode. This high-density current is produced by field-enhanced thermionic emission from the ion beam-heated surface of a molybdenum cathode. This work reports the use of this cathode as a beam source, and is to be distinguished from previous work reporting hollow cathode-produced electron beams. An electron beam of more than 260 A Peak current has been produced with 15 kV applied voltage. An efficiency of ∼10% is estimated. These experimental results encourage further investigation of the super-emissive cathode as an intense electron beam source for applications including accelerator technology

  14. Reflective article having a sacrificial cathodic layer

    Science.gov (United States)

    Kabagambe, Benjamin; Buchanan, Michael J.; Scott, Matthew S.; Rearick, Brian K.; Medwick, Paul A.; McCamy, James W.

    2017-09-12

    The present invention relates to reflective articles, such as solar mirrors, that include a sacrificial cathodic layer. The reflective article, more particularly includes a substrate, such as glass, having a multi-layered coating thereon that includes a lead-free sacrificial cathodic layer. The sacrificial cathodic layer includes at least one transition metal, such as a particulate transition metal, which can be in the form of flakes (e.g., zinc flakes). The sacrificial cathodic layer can include an inorganic matrix formed from one or more organo-titanates. Alternatively, the sacrificial cathodic layer can include an organic polymer matrix (e.g., a crosslinked organic polymer matrix formed from an organic polymer and an aminoplast crosslinking agent). The reflective article also includes an outer organic polymer coating, that can be electrodeposited over the sacrificial cathodic layer.

  15. Peculiarities in film growth of ferroelectric complex oxides in ion-plasma sputtering

    International Nuclear Information System (INIS)

    Mukhortov, V.M.; Golovko, Yu.I.; Mukhortov, Vl.M.; Dudkevich, V.P.

    1981-01-01

    Experimental investigation into the process of complex oxide film growth (using BaTiO 3 and (Ba,Sr)TiO 3 as an example) during ion-plasma sputtering has been carried out. It is shown that neutral excited atoms are knocked out of a ceramic target during its ion bombardment. Removing from the target they loss energy at the expence of collisions and at some distance hsub(cr) the oxidation reaction (BaO, TiO, TiO 2 , SrO) becomes possible. So the ''construction'' material comes in either in the form of atoms or in the form of molecules of simple oxides depending on a distance between cathode and substrate. Two mechanisms of synthesis and crystallization distinguished with dependences of growth rate, elementary cell parameters and other structure characteristics on precipitation temperature correspond to two precipitation mechanisms. Part of re-evaporation and reduction processes is discussed [ru

  16. Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, Grant E.; Moser, Trevor; Engelhard, Mark; Browning, Nigel D.; Laskin, Julia

    2016-11-07

    About 40 years ago, it was shown that tungsten carbide exhibits similar catalytic behavior to Pt for certain commercially relevant reactions, thereby suggesting the possibility of cheaper and earth-abundant substitutes for costly and rare precious metal catalysts. In this work, reactive magnetron sputtering of Ta in the presence of three model hydrocarbons (2-butanol, heptane, and m-xylene) combined with gas aggregation and ion soft landing was employed to prepare organic-inorganic hybrid nanoparticles (NPs) on surfaces for evaluation of catalytic activity and durability. The electro-catalytic behavior of the NPs supported on glassy carbon was evaluated in acidic aqueous solution by cyclic voltammetry. The Ta-heptane and Ta-xylene NPs were revealed to be active and robust toward promotion of the oxygen reduction reaction, an important process occurring at the cathode in fuel cells. In comparison, pure Ta and Ta-butanol NPs were essentially unreactive. Characterization techniques including atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM) were applied to probe how different sputtering conditions such as the flow rates of gases, sputtering current, and aggregation length affect the properties of the NPs. AFM images reveal the focused size of the NPs as well as their preferential binding along the step edges of graphite surfaces. In comparison, TEM images of the same NPs on carbon grids show that they bind randomly to the surface with some agglomeration but little coalescence. The TEM images also reveal morphologies with crystalline cores surrounded by amorphous regions for NPs formed in the presence of 2-butanol and heptane. In contrast, NPs formed in the presence of m-xylene are amorphous throughout. XPS spectra indicate that while the percentage of Ta, C, and O in the NPs varies depending on the sputtering conditions and hydrocarbon employed, the electron binding energies of the elements are similar

  17. Preventing Corrosion by Controlling Cathodic Reaction Kinetics

    Science.gov (United States)

    2016-03-25

    3. DATES COVERED (From - To) 09/23/15 - 04/22/16 4. TITLE AND SUBTITLE Sa. CONTRACT NUMBER Preventing Corrosion by Controlling Cathodic Reaction...Preventing corrosion by controlling cathodic reaction kinetics Progress Report for Period: 1 SEP 2015-31 MAR 2016 John Keith Department of...25 March 2016 Preventing corrosion by controlling cathodic reaction kinetics Annual Summary Report: FY16 PI: John Keith, 412-624-7016,jakeith

  18. Hollow cathode for positive ion sources

    International Nuclear Information System (INIS)

    Schechter, D.E.; Kim, J.; Tsai, C.C.

    1979-01-01

    Development to incorporate hollow cathodes into high power ion sources for neutral beam injection systems is being pursued. Hollow tube LaB 6 -type cathodes, similar to a UCLA design, have been constructed and tested in several ORNL ion source configurations. Results of testing include arc discharge parameters of >1000 and 500 amps for 0.5 and 10 second pulse lengths, respectively. Details of cathode construction and additional performance results are discussed

  19. Cold cathode arc model in mercury discharges

    International Nuclear Information System (INIS)

    Li, Y.M.; Byszewski, W.W.; Budinger, A.B.

    1990-01-01

    Voltage/current characteristics measured during the starting of metal halide lamps indicate a low voltage discharge when condensates (mainly mercury) are localized on the electrodes. In this case, even with a cold cathode which does not emit electrons, the current is very high and voltage across the lamp drops to about 15 to 20 V. This type of discharge is similar to the cold cathode mercury vapor arc found in mercury pool rectifiers. The cathode sheath in the mercury vapor arc is characterized by very small cathode spot size, on the order of 10 -c cm 2 , very high current density of about 10 6 A/cm 2 and very low cathode fall of approximately 10 volts. The discharge is modified and generalized to describe the cathode phenomena in the cold cathode mercury vapor arc. The sensitivity of calculated discharge parameters with respect to such modifications were examined. Results show that the cathode fall voltage remains fairly constant (7-8 volts) with large fractional variations of metastable mercury atoms bombarding the cathode. This result compares very well with experimental waveforms when anode fall and plasma voltage approximations are incorporated

  20. Two-beam virtual cathode accelerator

    International Nuclear Information System (INIS)

    Peter, W.

    1992-01-01

    A proposed method to control the motion of a virtual cathode is investigated. Applications to collective ion acceleration and microwave generation are indicated. If two counterstreaming relativistic electron beams of current I are injected into a drift tube of space-charge-limiting current I L = 2I, it is shown that one beam can induce a moving virtual cathode in the other beam. By dynamically varying the current injected into the drift tube region, the virtual cathode can undergo controlled motion. For short drift tubes, the virtual cathodes on each end are strongly-coupled and undergo coherent large-amplitude spatial oscillations within the drift tube

  1. Reactive magnetron sputtering of N-doped carbon thin films on quartz glass for transmission photocathode applications

    Science.gov (United States)

    Balalykin, N. I.; Huran, J.; Nozdrin, M. A.; Feshchenko, A. A.; Kobzev, A. P.; Sasinková, V.; Boháček, P.; Arbet, J.

    2018-03-01

    N-doped carbon thin films were deposited on a silicon substrate and quartz glass by RF reactive magnetron sputtering using a carbon target and an Ar+N2 gas mixture. During the magnetron sputtering, the substrate holder temperatures was kept at 800 °C. The carbon film thickness on the silicon substrate was about 70 nm, while on the quartz glass it was in the range 15 nm – 60 nm. The elemental concentration in the films was determined by RBS and ERD. Raman spectroscopy was used to evaluate the intensity ratios I D/I G of the D and G peaks of the carbon films. The transmission photocathodes prepared were placed in the hollow-cathode assembly of a Pierce-structure DC gun to produce photoelectrons. The quantum efficiency (QE) was calculated from the laser energy and cathode charge measured. The properties of the transmission photocathodes based on semitransparent N-doped carbon thin films on quartz glass and their potential for application in DC gun technology are discussed.

  2. Cathode materials: A personal perspective

    Energy Technology Data Exchange (ETDEWEB)

    Goodenough, John B. [Texas Materials Institute, University of Texas at Austin, ETC 9.102, 1 University Station, Austin, TX 78712-1063 (United States)

    2007-12-06

    A thermodynamically stable rechargeable battery has a voltage limited by the window of the electrolyte. An aqueous electrolyte has a window of 1.2 eV, which prevents achieving the high energy density desired for many applications. A non-aqueous electrolyte with a window of 5 eV requires Li{sup +} rather than H{sup +} as the working ion. Early experiments with Li{sub x}TiS{sub 2} cathodes showed competitive capacity and rate capability, but problems with a lithium anode made the voltage of a safe cell based on a sulfide cathode too low to be competitive with a nickel/metal-hydride battery. Transition-metal oxides can give voltages of 4.5 V versus Li{sup +}/Li{sup 0}. However, the challenge with oxides has been to obtain a competitive capacity and rate capability while retaining a high voltage with low-cost, environmentally friendly cathode materials. Comparisons will be made between layered Li{sub 1-x}MO{sub 2}, spinels Li{sub 1-x}[M{sub 2}]O{sub 4}, and olivines Li{sub 1-x}MPO{sub 4} having 0 < x < 1. Although higher capacities can be obtained with layered Li{sub 1-x}MO{sub 2} compounds, which have enabled the wireless revolution, their metastability makes them unlikely to be used in power applications. The spinel and olivine framework structures have been shown to be capable of charge/discharge rates of over 10C with a suitable temperature range for plug-in hybrid vehicles. (author)

  3. Self-sputtering during ion precipitation and its influence on niobium film properties

    International Nuclear Information System (INIS)

    Belevskij, V.P.; Gusev, I.V.

    1987-01-01

    Cathode sputtering of niobium films under conditions of vacuum condensation with simultaneous Nb + ion bombardment at energy of E n =(1.6...6.4)x10 -16 J is studied. Calculation of experimental values of the sputtering coefficient S Nb is performed with respect to the film thickness in the field of action of a niobium ion beam. Using the four-probe method in helium cryostats superconducting properties are studied and the film texture is determined by the X ray diffraction analysis. With the E n growth S Nb increases from 1.1 to 3.1. The best correspondence of the experimental dependence S Nb (E n ) is provided by the semiempirical formula of Yamamura Y. et al. The consequence of the S Nb increase is a sharp decrease of the effective condensation rate v eff . In case of niobium condensation at v eff m , where v m is the velocity of movement of a quasidiffusive boundary of impurities from the substrate according to the model of ion mixing developed by Carter G. and Armour D. suppresion of texture formation and deterioration of superconducting properties of superthin films (about 10 nm) is observed that results from ion mixing of the film and substrate materials on the interface. For such condensation conditions the substrate itself is the main source of impurities in the film

  4. RF magnetron sputtering of a hydroxyapatite target: A comparison study on polytetrafluorethylene and titanium substrates

    Science.gov (United States)

    Surmenev, Roman A.; Surmeneva, Maria A.; Grubova, Irina Yu.; Chernozem, Roman V.; Krause, Bärbel; Baumbach, Tilo; Loza, Kateryna; Epple, Matthias

    2017-08-01

    A pure hydroxyapatite (HA) target was used to prepare the biocompatible coating of HA on the surface of a polytetrafluorethylene (PTFE) substrate, which was placed on the same substrate holder with technically pure titanium (Ti) in the single deposition runs by radio-frequency (RF) magnetron sputtering. The XPS, XRD and FTIR analyses of the obtained surfaces showed that for all substrates, instead of the HA coating deposition, the coating of a mixture of calcium carbonate and calcium fluoride was grown. According to SEM investigations, the surface of PTFE was etched, and the surface topography of uncoated Ti was preserved after the depositions. The FTIR results reveal no phosphate bonds; only calcium tracks were observed in the EDX-spectra on the surface of the coated PTFE substrates. Phosphate oxide (V), which originated from the target, could be removed using a vacuum pump system, or no phosphate-containing bonds could be formed on the substrate surface because of the severe substrate bombardment process, which prevented the HA coating deposition. The observed results may be connected with the surface re-sputtering effect of the growing film by high-energy negatively charged ions (most probably oxygen or fluorine), which are accelerated in the cathode dark sheath.

  5. Cathode-follower power amplifier

    International Nuclear Information System (INIS)

    Giordano, S.; Puglisi, M.

    1983-01-01

    In circular accelerators and particularly in storage rings it is essential that the total impedance, as seen by the beam, be kept below some critical value. A model of the accelerating system was built using a single-ended cathode-follower amplifier driving a ferrite-loaded cavity. The system operated at 234.5 kHz with a peak output voltage of +-10 kV on the gap. The dynamic output impedance, as measured on the gap, was < 15 ohms

  6. Deposition and characterization of sputtered hexaboride coatings; Abscheidung und Charakterisierung aufgestaeubter Hexaboridschichten

    Energy Technology Data Exchange (ETDEWEB)

    Waldhauser, W

    1996-06-01

    Hexaborides of the rare-earth elements ReB{sub 6} are potential materials for cathode applications since they combine properties such as low work function, good electrical conductivity, high melting point as well as low volatility at high temperatures. Due to their high hardness and colorations ranging from blue to purple these compounds are also considered for applications to coatings for decoration of consumer products. At present, either rods of sintered LaB{sub 6} or single LaB{sub 6} crystals are indirectly heated to induce emission. In this workboride coatings were deposited onto various substrates employing non-reactive magnetron sputtering from LaB{sub 6}, CeB{sub 6}, SmB{sub 6} and YB{sub 6} targets. Coatings deposited were examined using scanning electron microscopy, X-ray diffraction, electron probe microanalysis. Vickers microhardness, colorimeter and spectroscopic ellipsometry measurements. Electron emission characteristics of the coatings were studied by the thermionic emission and the contact potential method. After optimization of the sputtering parameters fine-columnar or partially amorphous films with atomic ratios of boron to metal in the order of 5 to 7.5 were obtained. The tendency to form the corresponding hexaboride phase decreases from LaB{sub 6}, CeB{sub 6} and SmB{sub 6} to YB{sub 6}. The work function was measured to be in the range of 2.6 to 3.3 eV. Vickers microhardness values lie between 1500 and 2000 HVO.01. LaB{sub 6} coatings showed the most pronounced visual color impression corresponding to dark violet. The results obtained indicate that sputtered hexaboride films are well suited for decorative and thermionic applications. (author)

  7. Sputtering and reflection of self-bombardment of tungsten material

    Energy Technology Data Exchange (ETDEWEB)

    Niu, Guo-jian [University of Science and Technology of China, Hefei (China); Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi [Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Luo, Guang-nan, E-mail: gnluo@ipp.ac.cn [University of Science and Technology of China, Hefei (China); Institute of Plasma Physics Chinese Academy of Sciences, Hefei (China); Hefei Center for Physical Science and Technology, Hefei (China); Hefei Science Center of CAS, Hefei (China)

    2015-04-15

    In present research, the sputtering and reflection yield of self-bombardment of tungsten are investigated with the aid of molecular dynamics simulations. The source of sputtered and reflected atoms is detected by traced the original locations of sputtered and reflected atoms. Results show that for the reflected atoms no specific region exists which means cluster atoms are randomly reflected. But almost all of sputtered atoms are from a conical region under the landing point of cluster. So we can determine the sputtering yield by study the dimension of the sputtering region. Molecular dynamics shows the depth and radius of the conical are power functions of impacting energy. The effects of cluster size and temperature of target on sputtering and reflection rate are also preformed in present study. Both sputtering and reflection yield are proportion to cluster size in present cluster size, i.e. 66–2647 atoms. Higher target temperature can increase sputtering yield and deduce sputtering threshold energy, but little effect on reflection rate.

  8. Sputtering and reflection of self-bombardment of tungsten material

    International Nuclear Information System (INIS)

    Niu, Guo-jian; Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi; Luo, Guang-nan

    2015-01-01

    In present research, the sputtering and reflection yield of self-bombardment of tungsten are investigated with the aid of molecular dynamics simulations. The source of sputtered and reflected atoms is detected by traced the original locations of sputtered and reflected atoms. Results show that for the reflected atoms no specific region exists which means cluster atoms are randomly reflected. But almost all of sputtered atoms are from a conical region under the landing point of cluster. So we can determine the sputtering yield by study the dimension of the sputtering region. Molecular dynamics shows the depth and radius of the conical are power functions of impacting energy. The effects of cluster size and temperature of target on sputtering and reflection rate are also preformed in present study. Both sputtering and reflection yield are proportion to cluster size in present cluster size, i.e. 66–2647 atoms. Higher target temperature can increase sputtering yield and deduce sputtering threshold energy, but little effect on reflection rate

  9. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Z.L.

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error <10%) for m=3D0.2. It is also shown that, if the sputtering yield equals the corresponding one in Sigmund's theory, the depth of origin of sputtered atoms must be shorter than in Sigmund's theory for 0.25 m ≥ 3D 0. The former even may be only about one half of the latter as long as m=3D0. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)

  10. Pumping behavior of sputter ion pumps

    International Nuclear Information System (INIS)

    Chou, T.S.; McCafferty, D.

    The ultrahigh vacuum requirements of ISABELLE is obtained by distributed pumping stations. Each pumping station consists of 1000 l/s titanium sublimation pump for active gases (N 2 , H 2 , O 2 , CO, etc.), and a 20 l/s sputter ion pump for inert gases (methane, noble gases like He, etc.). The combination of the alarming production rate of methane from titanium sublimation pumps (TSP) and the decreasing pumping speed of sputter ion pumps (SIP) in the ultrahigh vacuum region (UHV) leads us to investigate this problem. In this paper, we first describe the essential physics and chemistry of the SIP in a very clean condition, followed by a discussion of our measuring techniques. Finally measured methane, argon and helium pumping speeds are presented for three different ion pumps in the range of 10 -6 to 10 -11 Torr. The virtues of the best pump are also discussed

  11. Cathodic hydrogen charging of zinc

    International Nuclear Information System (INIS)

    Panagopoulos, C.N.; Georgiou, E.P.; Chaliampalias, D.

    2014-01-01

    Highlights: •Incorporation of hydrogen into zinc and formation of zinc hydrides. •Investigation of surface residual stresses due to hydrogen diffusion. •Effect of hydrogen diffusion and hydride formation on mechanical properties of Zn. •Hydrogen embrittlement phenomena in zinc. -- Abstract: The effect of cathodic hydrogen charging on the structural and mechanical characteristics of zinc was investigated. Hardening of the surface layers of zinc, due to hydrogen incorporation and possible formation of ZnH 2 , was observed. In addition, the residual stresses brought about by the incorporation of hydrogen atoms into the metallic matrix, were calculated by analyzing the obtained X-ray diffraction patterns. Tensile testing of the as-received and hydrogen charged specimens revealed that the ductility of zinc decreased significantly with increasing hydrogen charging time, for a constant value of charging current density, and with increasing charging current density, for a constant value of charging time. However, the ultimate tensile strength of this material was slightly affected by the hydrogen charging procedure. The cathodically charged zinc exhibited brittle transgranular fracture at the surface layers and ductile intergranular fracture at the deeper layers of the material

  12. Ion source with plasma cathode

    International Nuclear Information System (INIS)

    Yabe, E.

    1987-01-01

    A long lifetime ion source with plasma cathode has been developed for use in ion implantation. In this ion source, a plasma of a nonreactive working gas serves as a cathode in place of a thermionic tungsten filament used in the Freeman ion source. In an applied magnetic field, the plasma is convergent, i.e., filamentlike; in zero magnetic field, it turns divergent and spraylike. In the latter case, the plasma exhibits a remarkable ability when the working gas has an ionization potential larger than the feed gas. By any combination of a working gas of either argon or neon and a feed gas of AsF 5 or PF 5 , the lifetime of this ion source was found to be more than 90 h with an extraction voltage of 40 kV and the corresponding ion current density 20 mA/cm 2 . Mass spectrometry results show that this ion source has an ability of generating a considerable amount of As + and P + ions from AsF 5 and PF 5 , and hence will be useful for realizing a fully cryopumped ion implanter system. This ion source is also eminently suitable for use in oxygen ion production

  13. Modification of low temperature deposited LiMn2O4 thin film cathodes by oxygen plasma irradiation

    International Nuclear Information System (INIS)

    Chen, Chen Chung; Chiu, Kuo-Feng; Lin, Kun Ming; Lin, Hsin Chih

    2009-01-01

    Lithium manganese oxides have been deposited by radio frequency magnetron sputter deposition with relatively lower annealing temperatures and then post-treated with a radio frequency (rf) driven oxygen plasma. Following oxygen plasma irradiation, the film properties were modified, and the performance of the thin film cathode has been enhanced. The electrochemical properties of the treated thin-film cathodes were characterized and compared. The results showed that the samples with moderate plasma treatment also maintained good cyclic properties as cycled at a wide range potential window of 2.0 V-4.5 V. Its electrochemical properties were significantly improved by this process, even though the films were prepared under low annealing temperature.

  14. Niobium sputter deposition on quarter wave resonators

    CERN Document Server

    Viswanadham, C; Jayaprakash, D; Mishra, R L

    2003-01-01

    Niobium sputter deposition on quarter wave copper R.F resonators, have been taken up in our laboratory, An ultra high vacuum system was made for this purpose. Niobium exhibits superconducting properties at liquid Helium temperature. A uniform coating of about 1.5 mu m of niobium on the internal surfaces of the copper resonant cavities is desired. Power dissipation in the resonators can be greatly reduced by making the internal surfaces of the R.F cavity super conducting. (author)

  15. Sputter coating of microspherical substrates by levitation

    Science.gov (United States)

    Lowe, A.T.; Hosford, C.D.

    Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.

  16. Origins of Beta Tantalum in Sputtered Coatings

    National Research Council Canada - National Science Library

    Mulligan, C

    2001-01-01

    .... Some of the most recent work has attempted to relate the energetics (i.e., atom/ion energy) of the plasma to the alpha right arrow beta transition. It has been shown that the energetics of the plasma can relate to the most crucial sputtering parameters. The most significant feature of the use of plasma energy to explain the alpha right arrow beta transition is that it relates the formation of beta-tantalum to a quantifiable measure.

  17. Pipelines cathodic protection design methodologies for impressed ...

    African Journals Online (AJOL)

    Several inadequate designs of cathodically polarized offshore and onshore pipelines have been reported in Nigeria owing to design complexity and application of the cathodic protection system. The present study focused on critical and detailed approach in impressed current and sacrificial anode design calculation ...

  18. Epitaxial growth of rhenium with sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Oh, Seongshik [National Institute of Standards and Technology, Boulder, CO 80305 (United States) and Department of Physics, University of Illinois, Urbana, IL 61801 (United States)]. E-mail: soh@boulder.nist.gov; Hite, Dustin A. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Cicak, K. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Osborn, Kevin D. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); Simmonds, Raymond W. [National Institute of Standards and Technology, Boulder, CO 80305 (United States); McDermott, Robert [University of California, Santa Barbara, CA 93106 (United States); Cooper, Ken B. [University of California, Santa Barbara, CA 93106 (United States); Steffen, Matthias [University of California, Santa Barbara, CA 93106 (United States); Martinis, John M. [University of California, Santa Barbara, CA 93106 (United States); Pappas, David P. [National Institute of Standards and Technology, Boulder, CO 80305 (United States)

    2006-02-21

    We have grown epitaxial Rhenium (Re) (0001) films on {alpha}-Al{sub 2}O{sub 3} (0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 deg. C and deposition rates below 0.1 nm/s. The epitaxial Re films are typically composed of terraced hexagonal islands with screw dislocations, and island size gets larger with high temperature post-deposition annealing. The growth starts in a three dimensional mode but transforms into two dimensional mode as the film gets thicker. With a thin ({approx}2 nm) seed layer deposited at room temperature and annealed at a high temperature, the initial three dimensional growth can be suppressed. This results in larger islands when a thick film is grown at 850 deg. C on the seed layer. We also find that when a room temperature deposited Re film is annealed to higher temperatures, epitaxial features start to show up above {approx}600 deg. C, but the film tends to be disordered.

  19. Model of dopant action in oxide cathodes

    International Nuclear Information System (INIS)

    Engelsen, Daniel den; Gaertner, Georg

    2005-01-01

    The paper describes an electrochemical model, which largely explains the formation of Ba in the oxide cathode at activation and normal operation. In a non-doped oxide cathode electrolysis of BaO is, besides the exchange reaction from the activators in the cathode nickel, an important source of Ba. By doping with rare earth oxides the conductivity of the oxide layer increases, which implies that the potential difference during current drawing over the oxide layer becomes lower and electrolysis of BaO is suppressed. This implies that the part of the electronic conductivity of the (Ba,Sr)O layer induced by the dopants also controls the sensitivity for poisoning: the higher the dopant level, the larger the sensitivity for poisoning. Furthermore, the suppression of electrolysis during normal operation largely explains why doped oxide cathodes have a better life performance than non-doped cathodes. Finally a hypothesis on the enhancement of sintering upon doping is presented

  20. Cathode Effects in Cylindrical Hall Thrusters

    Energy Technology Data Exchange (ETDEWEB)

    Granstedt, E.M.; Raitses, Y.; Fisch, N. J.

    2008-09-12

    Stable operation of a cylindrical Hall thruster (CHT) has been achieved using a hot wire cathode, which functions as a controllable electron emission source. It is shown that as the electron emission from the cathode increases with wire heating, the discharge current increases, the plasma plume angle reduces, and the ion energy distribution function shifts toward higher energies. The observed effect of cathode electron emission on thruster parameters extends and clarifies performance improvements previously obtained for the overrun discharge current regime of the same type of thruster, but using a hollow cathode-neutralizer. Once thruster discharge current saturates with wire heating, further filament heating does not affect other discharge parameters. The saturated values of thruster discharge parameters can be further enhanced by optimal placement of the cathode wire with respect to the magnetic field.

  1. Influence of surface topography on the sputtering yields of silver

    International Nuclear Information System (INIS)

    Pan Jisheng; Wang Zhenxia; Tao Zhenlan; Zhang Jiping

    1992-01-01

    The sputtering yields of silver have been measured as a function of the fluence of incident Ar + ions (27 keV) using the collector technique and RBS analysis. The irradiated surface was examined by scanning electron microscopy (SEM). It is shown that the sputtering yields of surfaces with topography are enhanced relative to smooth surfaces of silver, but the extent of the enhancement depends on the irradiation dose. The experimental results can be explained assuming that the surface topography and sputtering yield are a function of incident angle. It is obvious that the surface topography is an important factor to influence the sputtering yield. The term ''apparent sputtering yield'' has specifically been used when referring to the experimental sputtering yield of a surface with topography, to emphasize the difference with a smooth surface. (orig.)

  2. Tests of a new axial sputtering technique in an ECRIS

    International Nuclear Information System (INIS)

    Scott, R.; Pardo, R.; Vondrasek, R.

    2012-01-01

    Axial and radial sputtering techniques have been used over the years to create beams from an ECRIS at multiple accelerator facilities. Operational experience has shown greater beam production when using the radial sputtering method versus axial sputtering. At Argonne National Laboratory, previous work with radial sputtering has demonstrated that the position of the sputter sample relative to the plasma chamber wall influences sample drain current, beam production and charge state distribution. The possibility of the chamber wall acting as a ground plane which influences the sputtering of material has been considered, and an attempt has been made to mimic this possible ground plane effect with a coaxial sample introduced from the injection end. Results of these tests will be shown as well as comparisons of outputs using the two methods. The paper is followed by the associated poster. (authors)

  3. Dwell time dependent morphological transition and sputtering yield of ion sputtered Sn

    International Nuclear Information System (INIS)

    Qian, H X; Zeng, X R; Zhou, W

    2010-01-01

    Self-organized nano-scale patterns may appear on a wide variety of materials irradiated with an ion beam. Good manipulation of these structures is important for application in nanostructure fabrication. In this paper, dwell time has been demonstrated to be able to control the ripple formation and sputtering yield on Sn surface. Ripples with a wavelength of 1.7 μm were observed for a dwell time in the range 3-20 μs, whereas much finer ripples with a wavelength of 540 nm and a different orientation were observed for a shorter dwell time in the range 0.1-2 μs. The sputtering yield increases with dwell time significantly. The results provide a new basis for further steps in the theoretical description of morphology evolution during ion beam sputtering.

  4. Matted-fiber divertor tagets for sputter resistance

    International Nuclear Information System (INIS)

    Gierszewski, P.J.; Todreas, N.E.; Mikic, B.; Yang, T.F.

    1981-06-01

    Reductions in net sputtering yields can be obtained by altering the surface topography to maximize redeposition of sputtered atoms. A simple analysis is used to indicate a potential reduction by a factor of 2 to 5 for matted fiber divertor targets, relatively independent of incident, reflected and sputtered atom distributions. The fiber temperature is also shown to be acceptable, even up to 10 MW/m 2 , for reasonably combinations of materials, fiber diameter and fiber spacing

  5. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  6. Computer simulation of the self-sputtering of uranium

    International Nuclear Information System (INIS)

    Robinson, M.T.

    1983-01-01

    The sputtering of polycrystalline α-uranium by uranium ions of energies below 10 keV has been studied in the binary collision approximation using the computer simulation program marlowe. Satisfactory agreement of the computed sputtering yields with the small amount of available experimental data was achieved using the Moliere interatomic potential, a semilocal inelastic loss function, and a planar surface binding barrier, all with conventional parameters. The model is used to discuss low energy sputtering processes and the energy and angular distributions of the reflected primaries and the sputtered target particles

  7. Sputtering induced surface composition changes in copper-palladium alloys

    International Nuclear Information System (INIS)

    Sundararaman, M.; Sharma, S.K.; Kumar, L.; Krishnan, R.

    1981-01-01

    It has been observed that, in general, surface composition is different from bulk composition in multicomponent materials as a result of ion beam sputtering. This compositional difference arises from factors like preferential sputtering, radiation induced concentration gradients and the knock-in effect. In the present work, changes in the surface composition of copper-palladium alloys, brought about by argon ion sputtering, have been studied using Auger electron spectroscopy. Argon ion energy has been varied from 500 eV to 5 keV. Enrichment of palladium has been observed in the sputter-altered layer. The palladium enrichment at the surface has been found to be higher for 500 eV argon ion sputtering compared with argon ion sputtering at higher energies. Above 500 eV, the surface composition has been observed to remain the same irrespective of the sputter ion energy for each alloy composition. The bulk composition ratio of palladium to copper has been found to be linearly related to the sputter altered surface composition ratio of palladium to copper. These results are discussed on the basis of recent theories of alloy sputtering. (orig.)

  8. Batteries: Overview of Battery Cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Doeff, Marca M

    2010-07-12

    The very high theoretical capacity of lithium (3829 mAh/g) provided a compelling rationale from the 1970's onward for development of rechargeable batteries employing the elemental metal as an anode. The realization that some transition metal compounds undergo reductive lithium intercalation reactions reversibly allowed use of these materials as cathodes in these devices, most notably, TiS{sub 2}. Another intercalation compound, LiCoO{sub 2}, was described shortly thereafter but, because it was produced in the discharged state, was not considered to be of interest by battery companies at the time. Due to difficulties with the rechargeability of lithium and related safety concerns, however, alternative anodes were sought. The graphite intercalation compound (GIC) LiC{sub 6} was considered an attractive candidate but the high reactivity with commonly used electrolytic solutions containing organic solvents was recognized as a significant impediment to its use. The development of electrolytes that allowed the formation of a solid electrolyte interface (SEI) on surfaces of the carbon particles was a breakthrough that enabled commercialization of Li-ion batteries. In 1990, Sony announced the first commercial batteries based on a dual Li ion intercalation system. These devices are assembled in the discharged state, so that it is convenient to employ a prelithiated cathode such as LiCoO{sub 2} with the commonly used graphite anode. After charging, the batteries are ready to power devices. The practical realization of high energy density Li-ion batteries revolutionized the portable electronics industry, as evidenced by the widespread market penetration of mobile phones, laptop computers, digital music players, and other lightweight devices since the early 1990s. In 2009, worldwide sales of Li-ion batteries for these applications alone were US$ 7 billion. Furthermore, their performance characteristics (Figure 1) make them attractive for traction applications such as

  9. Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films

    Energy Technology Data Exchange (ETDEWEB)

    Hovsepian, Papken Eh.; Sugumaran, Arunprabhu A., E-mail: Arunprabhu.ArunachalamSugumaran@student.shu.ac.uk; Purandare, Yashodhan; Loch, Daniel A.L.; Ehiasarian, Arutiun P.

    2014-07-01

    TiN films were deposited using high power impulse magnetron sputtering (HIPIMS) enabled four cathode industrial size coating system equipped with HIPIMS power supplies. The standard version of this system allows control over the ion bombardment during coating growth by varying the strength of the electromagnetic field of the unbalancing coils and bias voltage applied to the substrate. The coatings were produced in different coating growth conditions achieved in combined HIPIMS — direct current (dc) unbalanced magnetron sputtering (HIPIMS/UBM) processes where HIPIMS was used as an additional tool to manipulate the ionisation degree in the plasma. Four cathode combinations were explored with increasing contribution of HIPIMS namely 4UBM (pure UBM), 1HIPIMS + 3UBM, 2HIPIMS + 2UBM and 2HIPIMS (pure HIPIMS) to deposit TiN coatings. Optical emission spectroscopy (OES) measurements were carried out to examine the plasma generated by the various combinations of HIPIMS and UBM cathodes. The micro-structural study was done by scanning electron microscopy (SEM). X-ray diffraction (XRD) technique was used to calculate the residual stress and texture parameter. It has been revealed that the residual stress can be controlled in a wide range from − 0.22 GPa to − 11.67 GPa by intelligent selection of the degree of HIPIMS utilisation, strength of the electromagnetic field of the unbalancing coils and the bias voltage applied to the substrate while maintaining the stoichiometry of the coatings. The effect of the degree of HIPIMS utilisation on the microstructure, texture and residual stress is discussed. Combining HIPIMS with dc-UBM sputtering is also seen as an effective tool for improving the productivity of the deposition process. - Highlights: • High {Ti"1"+} in the plasma with increasing number of HIPIMS sources • Residual stress can be manipulated in a wide range. • Texture can be altered. • The 2HIPIMS + 2UBM combination appears to be the most advantageous.

  10. Design Of Photovoltaic Powered Cathodic Protection System

    Directory of Open Access Journals (Sweden)

    Golina Samir Adly

    2017-07-01

    Full Text Available The corrosion caused by chemical reaction between metallic structures and surrounding mediums such as soil or water .the CP cathodic protection system is used to protect metallic structure against corrosion. Cathodic protection CP used to minimize corrosion by utilizing an external source of electrical current which forces the entire structure to become a cathode. There are two Types of cathodic protection system Galvanic current Impressed current.the Galvanic current is called a sacrificial anode is connected to the protected structure cathode through a DC power supply. In Galvanic current system a current passes from the sacrificing anode to the protected structure .the sacrificial anode is corroded rather than causing the protected structure corrosion .protected structure requires a constant current to stop the corrosion which determined by area structure metal and the surrounding medium. The rains humidity are decrease soil resistivity and increase the DC current .The corrosion and over protection resulting from increase in the DC current is harmful for the metallic structure. This problem can be solved by conventional cathodic protection system by manual adjustment of DC voltage periodically to obtain a constant current .the manual adjustment of DC voltage depends on experience of the technician and using the accuracy of the measuring equipment. The errors of measuring current depend on error from the technician or error from the measuring equipment. the corrosion of structure may occur when the interval between two successive adjustment is long .An automatically regulated cathodic protection system is used to overcome problems from conventional cathodic protection system .the regulated cathodic protection system adjust the DC voltage of the system automatically when it senses the variations of surrounding medium resistivity so the DC current is constant at the required level.

  11. Cathodic behavior of zirconium in aqueous solutions

    International Nuclear Information System (INIS)

    Hine, F.; Yasuda, M.; Sato, H.

    1977-01-01

    The electrochemical behavior of Zr was studied by polarization measurements. The surface oxide and zirconium hydride formed by cathodic polarization of Zr have been examined by X-ray, SEM, and a hardness tester. Zirconium hydride would form on Zr cathode after the surface oxide is reduced at the potential, which is several hundred mV more noble than the predicted value shown by the Pourbaix diagram. The parameters for the hydrogen evolution reaction on the hydride formed Zr cathode differs from that on the oxide covered surface, which means that hydrogen evolution takes place on both surfaces under a different mechanism, while details are still veiled at present

  12. Rechargeable lithium/polymer cathode batteries

    Science.gov (United States)

    Osaka, Tetsuya; Nakajima, Toshiki; Shiota, Koh; Owens, Boone B.

    1989-06-01

    Polypyrrole (PPy) and polyaniline (PAn) were investigated for cathode materials of rechargeable lithium batteries. PPy films prepared with PF6(-) anion and/or platinum substrate precoated with nitrile butadiene rubber (NBR) were excellent cathode materials because of rough and/or highly oriented film structure. PAn films were successfully prepared from non-aqueous propylene carbonate solution containing aniline, CF3COOH and lithium perchlorate. Its acidity strongly affects the anion doping-undoping behavior. The PAn cathode prepared in high acidic solution (e.g., 4:1 ratio of acid:aniline) gives the excellent battery performance.

  13. Numerical study on rectangular microhollow cathode discharge

    International Nuclear Information System (INIS)

    He Shoujie; Ouyang Jiting; He Feng; Li Shang

    2011-01-01

    Rectangular microhollow cathode discharge in argon is investigated by using two-dimensional time-dependent self-consistent fluid model. The electric potential, electric field, particle density, and mean electron energy are calculated. The results show that hollow cathode effect can be onset in the present configuration, with strong electric field and high mean electron energy in the cathode fall while high density and quasineutral plasma in the negative glow. The potential well and electric filed reversal are formed in the negative glow region. It is suggested that the presence of large electron diffusion flux necessitates the field reversal and potential well.

  14. Cold cathode diode X-ray source

    International Nuclear Information System (INIS)

    Cooperstein, G.; Lanza, R.C.; Sohval, A.R.

    1983-01-01

    A cold cathode diode X-ray source for radiation imaging, especially computed tomography, comprises a rod-like anode and a generally cylindrical cathode, concentric with the anode. The spacing between anode and cathode is so chosen that the diode has an impedance in excess of 100 ohms. The anode may be of tungsten, or of carbon with a tungsten and carbon coating. An array of such diodes may be used with a closely packed array of detectors to produce images of rapidly moving body organs, such as the beating heart. (author)

  15. Plasma distribution of cathodic ARC deposition system

    International Nuclear Information System (INIS)

    Anders, S.; Raoux, S.; Krishnan, K.; MacGill, R.A.; Brown, I.G.

    1996-01-01

    The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution

  16. Cathode protection for underground steel tanks

    International Nuclear Information System (INIS)

    Angelovski, Zoran

    1998-01-01

    Cathodic protection of underground petroleum storage tanks and piping systems is acceptable for both economic and ecological reasons. With out the cathodic protection of underground steel reservoirs, short time after the exploitation, there was a bore as a result of underground corrosion. The bore causes ecological consequences and at the same time its repair needs big investments. Furthermore, there are great number of tanks placed near cities, so in the future this problem needs a special attention in order to preserve ecological surrounding. The topic of this paper is underground corrosion as well as cathodic protection of steel tanks for oil derivatives storage. (author)

  17. Cyclotron resonance in a cathode ray tube

    International Nuclear Information System (INIS)

    Gherbanovschi, N.; Tanasa, M.; Stoican, O.

    2002-01-01

    Absorption of the RF energy by the electron beam in a cathode ray tube due to the cyclotron resonance is described. The cathode ray tube is placed within a Helmholtz coils system supplied by a sawtooth current generator. In order to generate RF field and to detect RF absorption a gate dip-meter equipped with a FET transistor is used. The bias voltage variations of the FET transistors as a function of the magnetic field are recorded. The operating point of the cathode ray tube has been chosen so that the relaxation oscillations of the detection system can be observed. (authors)

  18. Pumping behavior of sputtering ion pump

    Energy Technology Data Exchange (ETDEWEB)

    Chou, T.S.; Bittner, J.; Schuchman, J.

    1991-12-31

    To optimize the design of a distributed ion pump (DIP) for the Superconducting X-Ray Lithography Source (SXLS) the stability of the rotating electron cloud at very high magnetic field beyond transition, must be re-examined. In this work the pumping speed and frequency spectrum of a DIP at various voltages (1 to 10 KV) and various magnetic fields (0.1 to 4 Tesla) are measured. Three cell diameters 10 mm, 5 mm and 2.5 mm, each 8 mm long, and with 3 or 4 mm gaps between anode and cathode are investigated. In this study both the titanium cathodes and the stainless steel anode plates are perforated with holes comparable in size to the anode cell diameters. Only the partially saturated pumping behavior is under investigation. The ultimate pressure and conditioning of the pump will be investigated at a later date when the stability criterion for the electron cloud is better understood.

  19. Pumping behavior of sputtering ion pump

    Energy Technology Data Exchange (ETDEWEB)

    Chou, T.S.; Bittner, J.; Schuchman, J.

    1991-01-01

    To optimize the design of a distributed ion pump (DIP) for the Superconducting X-Ray Lithography Source (SXLS) the stability of the rotating electron cloud at very high magnetic field beyond transition, must be re-examined. In this work the pumping speed and frequency spectrum of a DIP at various voltages (1 to 10 KV) and various magnetic fields (0.1 to 4 Tesla) are measured. Three cell diameters 10 mm, 5 mm and 2.5 mm, each 8 mm long, and with 3 or 4 mm gaps between anode and cathode are investigated. In this study both the titanium cathodes and the stainless steel anode plates are perforated with holes comparable in size to the anode cell diameters. Only the partially saturated pumping behavior is under investigation. The ultimate pressure and conditioning of the pump will be investigated at a later date when the stability criterion for the electron cloud is better understood.

  20. Reactive sputter deposition of boron nitride

    International Nuclear Information System (INIS)

    Jankowski, A.F.; Hayes, J.P.; McKernan, M.A.; Makowiecki, D.M.

    1995-10-01

    The preparation of fully dense, boron targets for use in planar magnetron sources has lead to the synthesis of Boron Nitride (BN) films by reactive rf sputtering. The deposition parameters of gas pressure, flow and composition are varied along with substrate temperature and applied bias. The films are characterized for composition using Auger electron spectroscopy, for chemical bonding using Raman spectroscopy and for crystalline structure using transmission electron microscopy. The deposition conditions are established which lead to the growth of crystalline BN phases. In particular, the growth of an adherent cubic BN coating requires 400--500 C substrate heating and an applied -300 V dc bias

  1. Development of the sputter coater for hotcell

    Energy Technology Data Exchange (ETDEWEB)

    Chun, Yong Bum; Kwon, H. M.; Chun, Y. B.; Yang, Y. S.; Joo, J. S.; Jang, N. M

    2007-05-15

    In last december, the Wavelength Dispersive Spectroscopy (WDS) was installed on the shielded SEM of PIEF, KAERI. Before the first major WDS analysis service at the end of 2007, one among the prior technologies, the hot-cell sputter coater was remodelled from a commercial product and set up inside the glove box. This report describes effects of a coating layer on quantitative analysis, the remodelling of a coater suited to hot-cell, and the performance test of the remodelled coater. Also, written in 1998 was revised and appended to the report.

  2. Thermal conductivity of sputtered amorphous Ge films

    International Nuclear Information System (INIS)

    Zhan, Tianzhuo; Xu, Yibin; Goto, Masahiro; Tanaka, Yoshihisa; Kato, Ryozo; Sasaki, Michiko; Kagawa, Yutaka

    2014-01-01

    We measured the thermal conductivity of amorphous Ge films prepared by magnetron sputtering. The thermal conductivity was significantly higher than the value predicted by the minimum thermal conductivity model and increased with deposition temperature. We found that variations in sound velocity and Ge film density were not the main factors in the high thermal conductivity. Fast Fourier transform patterns of transmission electron micrographs revealed that short-range order in the Ge films was responsible for their high thermal conductivity. The results provide experimental evidences to understand the underlying nature of the variation of phonon mean free path in amorphous solids

  3. Ion source with radiofrequency mass filter for sputtering purposes

    International Nuclear Information System (INIS)

    Sielanko, J.; Sowa, M.

    1990-01-01

    The Kaufman ion source with radiofrequency mass filter is described. The construction as well as operating characteristics of ion source are presented. The arrangement is suitable for range distribution measurements of implanted layers, where the sputtering rate has to be constant over the wide range of sputtering time. 4 figs., 17 refs. (author)

  4. Low-dose effects in the sputtering of evaporated films

    International Nuclear Information System (INIS)

    Florio, A.R.O.; Alonso, E.V.; Baragiola, R.A.; Ferron, J.

    1983-01-01

    We report measurements of the dose dependence of the sputtering of evaporated films by 30 keV ions under UHV. An initial (sub-monolayer) enhanced sputtering is attributed to the removal of weakly bound atoms; this enhancement does not depend on the incidence angle of the projectile. (author)

  5. Low-dose effects in the sputtering of evaporated films

    Energy Technology Data Exchange (ETDEWEB)

    Florio, A.R.O.; Alonso, E.V.; Baragiola, R.A.; Ferron, J. (Comision Nacional de Energia Atomica, San Carlos de Bariloche (Argentina). Centro Atomico Bariloche)

    1983-05-01

    We report measurements of the dose dependence of the sputtering of evaporated films by 30 keV ions under UHV. An initial (sub-monolayer) enhanced sputtering is attributed to the removal of weakly bound atoms; this enhancement does not depend on the incidence angle of the projectile.

  6. Formation of large clusters during sputtering of silver

    International Nuclear Information System (INIS)

    Staudt, C.; Heinrich, R.; Wucher, A.

    2000-01-01

    We have studied the formation of polyatomic clusters during sputtering of metal surfaces by keV ion bombardment. Both positively charged (secondary cluster ions) and neutral clusters have been detected in a time-of-flight mass spectrometer under otherwise identical experimental conditions, the sputtered neutrals being post-ionized by single photon absorption using a pulsed 157 nm VUV laser beam. Due to the high achievable laser intensity, the photoionization of all clusters could be saturated, thus enabling a quantitative determination of the respective partial sputtering yields. We find that the relative yield distributions of sputtered clusters are strongly correlated with the total sputtering yield in a way that higher yields lead to higher abundances of large clusters. By using heavy projectile ions (Xe + ) in connection with bombarding energies up to 15 keV, we have been able to detect sputtered neutral silver clusters containing up to about 60 atoms. For cluster sizes above 40 atoms, doubly charged species are shown to be produced in the photoionization process with non-negligible efficiency. From a direct comparison of secondary neutral and ion yields, the ionization probability of sputtered clusters is determined as a function of the cluster size. It is demonstrated that even the largest silver clusters are still predominantly sputtered as neutrals

  7. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  8. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...

  9. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    being prepared by RF sputtering and their application in MEMS being explored. ... crystallographic properties were evaluated using XRD analysis (CuKα radiation ..... Bhatt V, Pal P, Chandra S 2005 Feasibility study of RF sputtered ZnO film for ...

  10. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  11. Modeling High Pressure Micro Hollow Cathode Discharges

    National Research Council Canada - National Science Library

    Boeuf, Jean-Pierre; Pitchford, Leanne

    2004-01-01

    This report results from a contract tasking CPAT as follows: The Grantee will perform theoretical modeling of point, surface, and volume high-pressure plasmas created using Micro Hollow Cathode Discharge sources...

  12. RF Electron Gun with Driven Plasma Cathode

    CERN Document Server

    Khodak, Igor

    2005-01-01

    It's known that RF guns with plasma cathodes based on solid-state dielectrics are able to generate an intense electron beam. In this paper we describe results of experimental investigation of the single cavity S-band RF gun with driven plasma cathode. The experimental sample of the cathode based on ferroelectric ceramics has been designed. Special design of the cathode permits to separate spatially processes of plasma development and electron acceleration. It has been obtained at RF gun output electron beam with particle energy ~500 keV, pulse current of 4 A and pulse duration of 80 ns. Results of experimental study of beam parameters are referred in. The gun is purposed to be applied as the intense electron beam source for electron linacs.

  13. Rare earth oxide doping in oxide cathodes

    International Nuclear Information System (INIS)

    Engelsen, Daniel den; Gaertner, Georg

    2006-01-01

    The effect on life performance and poisoning with O 2 by doping oxide cathodes with rare earth oxides and pseudo rare earth oxides, notably yttria, is qualitatively explained in terms of electrolysis of BaO during emission of electrons. Doped cathodes show less electrolysis and consume therefore less Ba during life: consequently, doped cathodes have a better life performance. However, the lower Ba-production makes doped cathodes more sensitive to oxygen poisoning. The experimentally found relation between conductivity and yttria concentration was the motive to propose a new model for the crystal imperfections in BaO. In this new imperfection model most Y 3+ -ions will combine with barium vacancies, therefore, the increase of the conductivity is modest and also the effect on the position of the Fermi level is modest. By assuming a combination of bulk and surface conductivity, the agreement between experiment and theory can be improved further

  14. Concentration changes due to cathodic protection

    NARCIS (Netherlands)

    Gellings, P.J.

    1978-01-01

    By solving the appropriate diffusion equations the concentration changes are calculated in the environment of underground structures protected cathodically. It is shown that these changes are negligible under all practical circumstances.

  15. Electrodeposition of uranium in stirred liquid cadmium cathode

    International Nuclear Information System (INIS)

    Koyama, T.; Tanaka, H.

    1997-01-01

    The electrodeposition of U in a liquid Cd cathode was known to be hampered by the formation of dendritic U on the Cd surface. Electrotransports of uranium to the stirred liquid Cd cathode were carried out at 773 K for different cathode current densities and different Reynolds number of stirring. The maximum amount of U taken in the liquid Cd cathode without forming dendrites was found to increase with an increasing Reynolds number of stirring and decrease with increasing cathode current density. (orig.)

  16. Plasma generation using the hollow cathod

    International Nuclear Information System (INIS)

    Moon, K.J.

    1983-01-01

    A hollow cathode of tungsten was adapted to an University of California, Berkely, LBL bucket ion source to investigate ion density fluctuations at the extractior grid. Fluctuations in plasma ion density are observed to range between 100kHz to 2 MHz. The observed fluctuation frequencies of plasma ion density are found to be inversely proportional to the square root of ion masses. It is guessed that the plasma fluctuation are also correlated with the hollow cathode length. (Author)

  17. Modelling of low energy ion sputtering from oxide surfaces

    International Nuclear Information System (INIS)

    Kubart, T; Nyberg, T; Berg, S

    2010-01-01

    The main aim of this work is to present a way to estimate the values of surface binding energy for oxides. This is done by fitting results from the binary collisions approximation code Tridyn with data from the reactive sputtering processing curves, as well as the elemental composition obtained from x-ray photoelectron spectroscopy (XPS). Oxide targets of Al, Ti, V, Nb and Ta are studied. The obtained surface binding energies are then used to predict the partial sputtering yields. Anomalously high sputtering yield is observed for the TiO 2 target. This is attributed to the high sputtering yield of Ti lower oxides. Such an effect is not observed for the other studied metals. XPS measurement of the oxide targets confirms the formation of suboxides during ion bombardment as well as an oxygen deficient surface in the steady state. These effects are confirmed from the processing curves from the oxide targets showing an elevated sputtering rate in pure argon.

  18. Simulation of carbon sputtering due to molecular hydrogen impact

    International Nuclear Information System (INIS)

    Laszlo, J.

    1993-01-01

    Simulated results are compared to experimental data on the sputtering yield of carbon due to atomic and to molecular hydrogen impact. The experimental sputtering yields of carbon (graphite) due to low energy hydrogen bombardment have been found to be higher than the simulated ones. Efforts are made to obtain high enough simulated yields by considering the formation of dimer, H 2 and D 2 molecules in the primary beam. The molecular beam model applies full neutralization and full dissociation at the surface. The simulation of sputtering yields of target materials up to Z 2 ≤ 30 is also included for the low primary energy regime for deuterium projectiles. It is found that, although the sputtering yields really tend to increase, the effect of molecule formation in the beam in itself cannot be made responsible for the deviation between measured and simulated sputtering yields. (orig.)

  19. Electrochemical synthesis of gold nanorods in track-etched polycarbonate membrane using removable mercury cathode

    International Nuclear Information System (INIS)

    Sharma, Manoj K.; Ambolikar, Arvind S.; Aggarwal, Suresh K.

    2012-01-01

    The electrochemical template synthesis of gold nanorods within the cylindrical pores of track-etched polycarbonate (PC) membrane using a removable mercury cathode is reported. The novelty of this new approach is that it eliminates the requirement of coating an approximately 500 nm–1 μm-thick metallic layer, as conducting substrate, onto one surface of the insulating template membrane by the sputter deposition technique. A two-compartment electrochemical cell was designed and used for this work. The PC membrane was placed between the two compartments separating the aqueous solution of HAuCl 4 from mercury. Mercury, filled in one of the compartments, is in contact with one surface of the membrane (similar to sputter-deposited metallic layer) and serves as the conducting substrate/cathode for the electrochemical deposition of gold in the nanopores of track-etched PC membrane. Once the electrodeposition is completed, the mercury and the HAuCl 4 solution are removed from the compartments, and a malleable track-etched PC membrane embedded with free-standing gold nanorods is obtained. The ensemble of the metal nanorods grown in the template membrane is not attached to any conducting substrate, and gold nanorods can be freed from the template membrane after the dissolution. The Au-deposited PC membrane and free-standing Au nanorods were characterized by EDXRF, XRD, UV–Visible spectroscopy, AFM, and FEG-TEM. The EDXRF and XRD studies confirmed the deposition of the face-centered cubic phase of Au in the pores of the PC membrane. The TEM studies showed the formation of a cigar-shaped gold nanorod in the cylindrical pores of the PC membrane. The diameter of gold nanorods ranges from 100 to 200 nm. The new approach is simple, cost-effective, and saves time.

  20. Development of plasma cathode electron guns

    Science.gov (United States)

    Oks, Efim M.; Schanin, Peter M.

    1999-05-01

    The status of experimental research and ongoing development of plasma cathode electron guns in recent years is reviewed, including some novel upgrades and applications to various technological fields. The attractiveness of this kind of e-gun is due to its capability of creating high current, broad or focused beams, both in pulsed and steady-state modes of operation. An important characteristic of the plasma cathode electron gun is the absence of a thermionic cathode, a feature which leads to long lifetime and reliable operation even in the presence of aggressive background gas media and at fore-vacuum gas pressure ranges such as achieved by mechanical pumps. Depending on the required beam parameters, different kinds of plasma discharge systems can be used in plasma cathode electron guns, such as vacuum arcs, constricted gaseous arcs, hollow cathode glows, and two kinds of discharges in crossed E×B fields: Penning and magnetron. At the present time, plasma cathode electron guns provide beams with transverse dimension from fractional millimeter up to about one meter, beam current from microamperes to kiloamperes, beam current density up to about 100 A/cm2, pulse duration from nanoseconds to dc, and electron energy from several keV to hundreds of keV. Applications include electron beam melting and welding, surface treatment, plasma chemistry, radiation technologies, laser pumping, microwave generation, and more.

  1. Thermal conductivities of thin, sputtered optical films

    International Nuclear Information System (INIS)

    Henager, C.H. Jr.; Pawlewicz, W.T.

    1991-05-01

    The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO 2 /Si 3 N 4 ) n and Al(Al 2 O 3 /AIN) n . Sputtered films of more conventional materials like SiO 2 , Al 2 O 3 , Ta 2 O 5 , Ti, and Si have also been measured. The data show that thin film thermal conductivities are typically 10 to 100 times lower than conductivities for the same materials in bulk form. Structural disorder in the amorphous or very fine-grained films appears to account for most of the conductivity difference. Conclusive evidence for a film/substrate interface contribution is presented

  2. Evolution of film temperature during magnetron sputtering

    International Nuclear Information System (INIS)

    Shaginyan, L.R.; Han, J.G.; Shaginyan, V.R.; Musil, J.

    2006-01-01

    We report on the results of measurements of the temperature T F surf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The T F surf and substrate temperature (T s ) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the T F surf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the T s after stopping the deposition. At the same time, the T s either does not change for the case of cooling substrate or increases to a certain level for noncooling substrate. However, in both cases the T s remains several times lower than the T F surf . The T F surf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of deg. C. This phenomenon is explained by a model assuming formation of a hot thin surface layer (HTSL) on the top of the growing film, which exists only during film deposition and exhibits extremely low thermal conductivity. Due to this unique property the temperature T F surf of HTSL is several times higher than the T s . Variations in the T F surf fairly correlate with structure changes of Cr films along thickness investigated in detail previously

  3. Experimental and analytical study of the sputtering phenomena

    International Nuclear Information System (INIS)

    Howard, P.A.

    1976-03-01

    One form of the sputtering phenomena, the heat-transfer process that occurs when an initially hot vertical surface is cooled by a falling liquid film, was examined from a new experimental approach. The sputtering front is the lowest wetted position on the vertical surface and is characterized by a short region of intense nucleate boiling. The sputtering front progresses downward at nearly a constant rate, the surface below the sputtering front being dry and almost adiabatic. This heat-transfer process is of interest in the analysis of some of the performance aspects of emergency core-cooling systems of light-water reactors. An experimental apparatus was constructed to examine the heat-transfer characteristics of a sputtering front. In the present study, a heat source of sufficient intensity was located immediately below the sputtering front, which prevented its downward progress, thus permitting detailed measurements of steady-state surface temperatures throughout a sputtering front. Experimental evidence showed the sputtering front to correspond to a critical heat-flux (CHF) phenomenon. Data were obtained with water flow rates of 350-1600 lb/sub m//hr-ft and subcoolings of 40-140 0 F on a 3 / 8 -in. solid copper rod at 1 atm. A two-dimensional analytical model was developed to describe a stationary sputtering front where the wet-dry interface corresponds to a CHF phenomena and the dry zone is adiabatic. This model is nonlinear because of the temperature dependence of the heat-transfer coefficient in the wetted region and has yielded good agreement with data. A simplified one-dimensional approximation was developed which adequately describes these data. Finally, by means of a coordinate transformation and additional simplifying assumptions, this analysis was extended to analyze moving sputtering fronts, and reasonably good agreement with reported data was shown

  4. Advanced capabilities and applications of a sputter-RBS system

    International Nuclear Information System (INIS)

    Brijs, B.; Deleu, J.; Beyer, G.; Vandervorst, W.

    1999-01-01

    In previous experiments, sputter-RBS 1 has proven to be an ideal tool to study the interaction of low energy ions. This contribution employs the same methodology to identify surface contamination induced during sputtering and to the determine absolute sputter yields. In the first experiment ERDA analysis was used to study the evolution of Hydrogen contamination during sputter-RBS experiments. Since the determination of Hydrogen concentration in very thin near surface layers is frequently limited by the presence of a strong surface peak of Hydrogen originating from adsorbed contamination of the residual vacuum, removal of this contamination would increase the sensitivity for Hydrogen detection in the near sub surface drastically. Therefore low energy (12 keV) Argon sputtering was used to remove the Hydrogen surface peak. However enhanced Hydrogen adsorption was observed related to the Ar dose. This experiment shows that severe vacuum conditions and the use of high current densities/sputter yields are a prerequisite for an efficient detection of Hydrogen in the near surface layers. In the second experiment, an attempt was made to determine the sputter yield of Cu during low energy (12 keV) Oxygen bombardment. In order to determine the accumulated dose of the low energy ion beam, a separate Faraday cup in combination with a remote controlled current have been added to the existing sputter-RBS set-up. Alternating sputtering and RBS analysis seem to be an adequate tool for the determination of the absolute sputter yield of Cu and this as well in the as under steady state conditions

  5. Hydrothermal synthesis of cathode materials

    Science.gov (United States)

    Chen, Jiajun; Wang, Shijun; Whittingham, M. Stanley

    A number of cathodes are being considered for the next generation of lithium ion batteries to replace the expensive LiCoO 2 presently used. Besides the layered oxides, such as LiNi yMn yCo 1-2 yO 2, a leading candidate is lithium iron phosphate with the olivine structure. Although this material is inherently low cost, a manufacturing process that produces electrochemically active LiFePO 4 at a low cost is also required. Hydrothermal reactions are one such possibility. A number of pure phosphates have been prepared using this technique, including LiFePO 4, LiMnPO 4 and LiCoPO 4; this method has also successfully produced mixed metal phosphates, such as LiFe 0.33Mn 0.33Co 0.33PO 4. Ascorbic acid was found to be better than hydrazine or sugar at preventing the formation of ferric ions in aqueous media. When conductive carbons are added to the reaction medium excellent electrochemical behavior is observed.

  6. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    International Nuclear Information System (INIS)

    Zhang, Lili; Xu, Xue; Wu, Yuejin

    2013-01-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N + and Ar + ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models

  7. On a relationship between the geometry of cones on sputtered surfaces and the angular dependence of sputtered yields

    International Nuclear Information System (INIS)

    Chadderton, L.T.

    1977-01-01

    It is widely believed that the phenomenon responsible for the familiar peak in the angular dependence of sputtered yields also gives rise to characteristic semiangles α of conical protruberances on sputtered surfaces. It is shown that α corresponds to the process giving rise to the minimum rather than the maximum. No accurate measurements of the minimum have yet been made. (Auth.)

  8. Plasma processes inside dispenser hollow cathodes

    International Nuclear Information System (INIS)

    Mikellides, Ioannis G.; Katz, Ira; Goebel, Dan M.; Polk, James E.; Jameson, Kristina K.

    2006-01-01

    A two-dimensional fluid model of the plasma and neutral gas inside dispenser orificed hollow cathodes has been developed to quantify plasma processes that ultimately determine the life of the porous emitters inserted in these devices. The model self-consistently accounts for electron emission from the insert as well as for electron and ion flux losses from the plasma. Two cathodes, which are distinctively different in size and operating conditions, have been simulated numerically. It is found that the larger cathode, with outer tube diameter of 1.5 cm and orifice diameter of 0.3 cm, establishes an effective emission zone that spans approximately the full length of the emitter when operated at a discharge current of 25 A and a flow rate of 5.5 sccm. The net heating of the emitter is caused by ions that are produced by ionization of the neutral gas inside the tube and are then accelerated by the sheath along the emitter. The smaller cathode, with an outer diameter of 0.635 cm and an orifice diameter of 0.1 cm, does not exhibit the same operational characteristics. At a flow rate of 4.25 sccm and discharge current of 12 A, the smaller cathode requires 4.5 times the current density near the orifice and operates with more than 6 times the neutral particle density compared to the large cathode. As a result, the plasma particle density is almost one order of magnitude higher compared to the large cathode. The plasma density in this small cathode is high enough such that the Debye length is sufficiently small to allow 'sheath funneling' into the pores of the emitter. By accessing areas deeper into the insert material, it is postulated that the overall emission of electrons is significantly enhanced. The maximum emission current density is found to be about 1 A/mm 2 in the small cathode, which is about one order of magnitude higher than attained in the large cathode. The effective emission zone in the small cathode extends to about 15% of the emitter length only, and the

  9. Studies on ion scattering and sputtering processes relevant to ion beam sputter deposition of multicomponent thin films

    International Nuclear Information System (INIS)

    Auciello, O.; Ameen, M.S.; Kingon, A.I.

    1989-01-01

    Results from computer simulation and experiments on ion scattering and sputtering processes in ion beam sputter deposition of high Tc superconducting and ferroelectric thin films are presented. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom ass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering Kr + or Xe + ions is preferable to the most commonly used Ar + ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing multicomponent oxide thin films by ion beam sputter-deposition. 10 refs., 5 figs

  10. Fluence-dependent sputtering yield of micro-architectured materials

    Energy Technology Data Exchange (ETDEWEB)

    Matthes, Christopher S.R.; Ghoniem, Nasr M., E-mail: ghoniem@ucla.edu; Li, Gary Z.; Matlock, Taylor S.; Goebel, Dan M.; Dodson, Chris A.; Wirz, Richard E.

    2017-06-15

    Highlights: • Sputtering yield is shown to be transient and heavily dependent on surface architecture. • Fabricated nano- and Microstructures cause geometric re-trapping of sputtered material, which leads to a self-healing mechanism. • Initially, the sputtering yield of micro-architectured Mo is approximately 1/2 the value as that of a planar surface. • The study demonstrates that the sputtering yield is a dynamic property, dependent on the surface structure of a material. • A developed phenomenological model mathematically describes the transient behavior of the sputtering yield as a function of plasma fluence. - Abstract: We present an experimental examination of the relationship between the surface morphology of Mo and its instantaneous sputtering rate as function of low-energy plasma ion fluence. We quantify the dynamic evolution of nano/micro features of surfaces with built-in architecture, and the corresponding variation in the sputtering yield. Ballistic deposition of sputtered atoms as a result of geometric re-trapping is observed, and re-growth of surface layers is confirmed. This provides a self-healing mechanism of micro-architectured surfaces during plasma exposure. A variety of material characterization techniques are used to show that the sputtering yield is not a fundamental property, but that it is quantitatively related to the initial surface architecture and to its subsequent evolution. The sputtering yield of textured molybdenum samples exposed to 300 eV Ar plasma is roughly 1/2 of the corresponding value for flat samples, and increases with ion fluence. Mo samples exhibited a sputtering yield initially as low as 0.22 ± 5%, converging to 0.4 ± 5% at high fluence. The sputtering yield exhibits a transient behavior as function of the integrated ion fluence, reaching a steady-state value that is independent of initial surface conditions. A phenomenological model is proposed to explain the observed transient sputtering phenomenon, and to

  11. Compact Rare Earth Emitter Hollow Cathode

    Science.gov (United States)

    Watkins, Ronald; Goebel, Dan; Hofer, Richard

    2010-01-01

    A compact, high-current, hollow cathode utilizing a lanthanum hexaboride (LaB6) thermionic electron emitter has been developed for use with high-power Hall thrusters and ion thrusters. LaB6 cathodes are being investigated due to their long life, high current capabilities, and less stringent xenon purity and handling requirements compared to conventional barium oxide (BaO) dispenser cathodes. The new cathode features a much smaller diameter than previously developed versions that permit it to be mounted on axis of a Hall thruster ( internally mounted ), as opposed to the conventional side-mount position external to the outer magnetic circuit ("externally mounted"). The cathode has also been reconfigured to be capable of surviving vibrational loads during launch and is designed to solve the significant heater and materials compatibility problems associated with the use of this emitter material. This has been accomplished in a compact design with the capability of high-emission current (10 to 60 A). The compact, high-current design has a keeper diameter that allows the cathode to be mounted on the centerline of a 6- kW Hall thruster, inside the iron core of the inner electromagnetic coil. Although designed for electric propulsion thrusters in spacecraft station- keeping, orbit transfer, and interplanetary applications, the LaB6 cathodes are applicable to the plasma processing industry in applications such as optical coatings and semiconductor processing where reactive gases are used. Where current electrical propulsion thrusters with BaO emitters have limited life and need extremely clean propellant feed systems at a significant cost, these LaB6 cathodes can run on the crudest-grade xenon propellant available without impact. Moreover, in a laboratory environment, LaB6 cathodes reduce testing costs because they do not require extended conditioning periods under hard vacuum. Alternative rare earth emitters, such as cerium hexaboride (CeB6) can be used in this

  12. 2013 Estorm - Invited Paper - Cathode Materials Review

    Energy Technology Data Exchange (ETDEWEB)

    Daniel, Claus [ORNL; Mohanty, Debasish [ORNL; Li, Jianlin [ORNL; Wood III, David L [ORNL

    2014-01-01

    The electrochemical potential of cathode materials defines the positive side of the terminal voltage of a battery. Traditionally, cathode materials are the energy-limiting or voltage-limiting electrode. One of the first electrochemical batteries, the voltaic pile invented by Alessandro Volta in 1800 (Phil. Trans. Roy. Soc. 90, 403 431) had a copper-zinc galvanic element with a terminal voltage of 0.76 V. Since then, the research community has increased capacity and voltage for primary (nonrechargeable) batteries and round-trip efficiency for secondary (rechargeable) batteries. Successful secondary batteries have been the lead acid with a lead oxide cathode and a terminal voltage of 2.1 V and later the NiCd with a nickel(III) oxide hydroxide cathode and a 1.2 V terminal voltage. The relatively low voltage of those aqueous systems and the low round-trip efficiency due to activation energies in the conversion reactions limited their use. In 1976, Wittingham (J. Electrochem. Soc., 123, 315) and Besenhard (J Power Sources 1(3), 267) finally enabled highly reversible redox reactions by intercalation of lithium ions instead of by chemical conversion. In 1980, Goodenough and Mizushima (Mater. Res. Bull. 15, 783 789) demonstrated a high-energy and high-power LiCoO2 cathode, allowing for an increase of terminal voltage far beyond 3 V. Over the past four decades, the international research community has further developed cathode materials of many varieties. Current state-of-the-art cathodes demonstrate voltages beyond any known electrolyte stability window, bringing electrolyte research once again to the forefront of battery research.

  13. High power pulsed magnetron sputtering of transparent conducting oxides

    International Nuclear Information System (INIS)

    Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D.J.

    2008-01-01

    High power pulsed magnetron sputtering (HPPMS) has been used in order to study the deposition of transparent conducting oxides. We summarize the studies carried out on different materials (indium tin oxide-ITO and aluminium-doped zinc oxide-AZO) using rather different technological approaches, namely sputtering of ceramic targets and reactive sputtering. For the deposition of AZO reactive HPPMS for metallic targets has been used. A feedback control loop has been implemented in order to stabilize the discharge at any given setpoint on the hysteresis curve. The hysteresis was also found to have a rather untypical form. Reactive HPPMS was found to be a promising tool for obtaining high quality films of low total thickness. In the case of ITO deposition a ceramic target has been used. The process has been characterized in terms of its plasma emission and increasing indium ionization was found for higher peak power densities. The properties of the deposited films were compared to DC sputtered films. While for DC sputtering the choice of oxygen addition and shieldings is crucial for determining surface morphology and resistivity, in HPPMS sputtering peak power density has been found to be a good parameter for influencing the crystal structure. The morphologies obtained differ strongly from those seen in DC sputtering. At high power densities films with low surface roughness and excellent resistivity could be deposited without the use of shieldings

  14. Reactive dual magnetron sputtering for large area application

    International Nuclear Information System (INIS)

    Struempfel, J.

    2002-01-01

    Production lines for large area coating demand high productivity of reactive magnetron sputtering processes. Increased dynamic deposition rates for oxides and nitrides were already obtained by using of highly powered magnetrons in combination with advanced sputter techniques. However, besides high deposition rates the uniformity of such coatings has to be carefully considered. First the basics of reactive sputtering processes and dual magnetron sputtering are summarized. Different methods for process stabilization and control are commonly used for reactive sputtering. The Plasma Emission Monitor (PE M) offers the prerequisite for fast acting process control derived from the in-situ intensity measurements of a spectral line of the sputtered target material. Combined by multiple Plasma Emission Monitor control loops segmented gas manifolds are able to provide excellent thin film uniformity at high deposition rates. The Dual Magnetron allows a broad range of processing by different power supply modes. Medium frequency, DC and pulsed DC power supplies can be used for high quality layers. Whereas the large area coating of highly isolating layers like TiO 2 or SiO 2 is dominated by MF sputtering best results for coating with transparent conductive oxides are obtained by dual DC powering of the dual magnetron arrangement. (Author)

  15. RF Magnetron Sputtering Deposited W/Ti Thin Film For Smart Window Applications

    Science.gov (United States)

    Oksuz, Lutfi; Kiristi, Melek; Bozduman, Ferhat; Uygun Oksuz, Aysegul

    2014-10-01

    Electrochromic (EC) devices can change reversible and persistent their optical properties in the visible region (400-800 nm) upon charge insertion/extraction according to the applied voltage. A complementary type EC is a device containing two electrochromic layers, one of which is anodically colored such as vanadium oxide (V2 O5) while the other cathodically colored such as tungsten oxide (WO3) which is separated by an ionic conduction layer (electrolyte). The use of a solid electrolyte such as Nafion eliminates the need for containment of the liquid electrolyte, which simplifies the cell design, as well as improves safety and durability. In this work, the EC device was fabricated on a ITO/glass slide. The WO3-TiO2 thin film was deposited by reactive RF magnetron sputtering using a 2-in W/Ti (9:1%wt) target with purity of 99.9% in a mixture gas of argon and oxygen. As a counter electrode layer, V2O5 film was deposited on an ITO/glass substrate using V2O3 target with the same conditions of reactive RF magnetron sputtering. Modified Nafion was used as an electrolyte to complete EC device. The transmittance spectra of the complementary EC device was measured by optical spectrophotometry when a voltage of +/-3 V was applied to the EC device by computer controlled system. The surface morphology of the films was characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM) (Fig. 2). The cyclic voltammetry (CV) for EC device was performed by sweeping the potential between +/-3 V at a scan rate of 50 mV/s.

  16. RF power dependent formation of amorphous MoO3-x nanorods by RF magnetron sputtering

    International Nuclear Information System (INIS)

    Navas, I.; Vinodkumar, R.; Detty, A.P.; Mahadevan Pillai, V.P.

    2009-01-01

    Full text: The fabrication of nanorods has received increasing attention for their unique physical and chemical properties and a wide range of potential applications such as photonics and nanoelectronics Molybdenum oxide nanorods with high activity can be used in a wide variety of applications such as cathodes in rechargeable batteries, field emission devices, solid lubricants, superconductors thermoelectric materials, and electrochromic devices. In this paper, amorphous MoO 3-x nanorods can find excellent applications in electrochromic and gas sensing have been successfully prepared by varying the R F power in R F Magnetron Sputtering system without heating the substrate; other parameters which are optimised in our earlier studies. We have found that the optimum RF power for nanorod formation is 200W. At a moderate RF power (200W), sputtering redeposition takes places constructively which leads to formation of fine nanorods. Large RF power creates high energetic ion bombardment on the grains surfaces which can lead to re-nucleation, so the grains become smaller and columnar growth is interrupted. Beyond the RF power 200W, the etching effect of the plasma became more severe and damaged the surface of the nanorods. All the molybdenum oxide films prepared are amorphous; the XRD patterns exhibit no characteristic peak corresponds to MoO 3 . The amorphous nature is preferred for good electrochromic colouration The spectroscopic properties of the nanorods have been investigated systematically using atomic force microscopy, x-ray diffraction, micro-Raman, UV-visible and photoluminescence (PL) spectroscopy. The films exhibit two emission bands; a near band edge UV emission and a defect related deep level visible emission

  17. Enhancement of Ti-containing hydrogenated carbon (Ti-C:H) films by high-power plasma-sputtering

    International Nuclear Information System (INIS)

    Gwo, Jyh; Chu, Chun-Lin; Tsai, Ming-Jui; Lee, Shyong

    2012-01-01

    Ti-containing amorphous hydrogenated carbon (Ti-C:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C 2 H 2 gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a Ti-TiC-DLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of Ti-C:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results.

  18. Enhancement of Ti-containing hydrogenated carbon (Tisbnd C:H) films by high-power plasma-sputtering

    Science.gov (United States)

    Gwo, Jyh; Chu, Chun-Lin; Tsai, Ming-Jui; Lee, Shyong

    2012-02-01

    Ti-containing amorphous hydrogenated carbon (Tisbnd C:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C2H2 gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a Tisbnd TiCsbnd DLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of Tisbnd C:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results.

  19. Production of rare-earth atomic negative ion beams in a cesium-sputter-type negative ion source

    International Nuclear Information System (INIS)

    Davis, V.T.; Covington, A.M.; Duvvuri, S.S.; Kraus, R.G.; Emmons, E.D.; Kvale, T.J.; Thompson, J.S.

    2007-01-01

    The desire to study negative ion structure and negative ion-photon interactions has spurred the development of ion sources for use in research and industry. The many different types of negative ion sources available today differ in their characteristics and abilities to produce anions of various species. Thus the importance of choosing the correct type of negative ion source for a particular research or industrial application is clear. In this study, the results of an investigation on the production of beams composed of negatively-charged rare-earth ions from a cylindrical-cathode-geometry, cesium-sputter-type negative ion source are presented. Beams of atomic anions have been observed for most of the first-row rare-earth elements, with typical currents ranging from hundreds of picoamps to several nanoamps

  20. Protection of p+-n-Si Photoanodes by Sputter-Deposited Ir/IrOxThin Films

    DEFF Research Database (Denmark)

    Mei, Bastian Timo; Seger, Brian; Pedersen, Thomas

    2014-01-01

    Sputter deposition of Ir/IrOx on p+-n-Si without interfacial corrosion protection layers yielded photoanodes capable of efficient water oxidation (OER) in acidic media (1 M H2SO4). Stability of at least 18 h was shown by chronoamperomety at 1.23 V versus RHE (reversible hydrogen electrode) under 38...... density of 1 mA/cm2 at 1.05 V vs. RHE. Further improvement by heat treatment resulted in a cathodic shift of 40 mV and enabled a current density of 10 mA/cm2 (requirements for a 10% efficient tandem device) at 1.12 V vs. RHS under irradiation. Thus, the simple IrOx/Ir/p+-n-Si structures not only provide...

  1. Effect of plasma immersion on crystallinity of V2O5 film grown by dc reactive sputtering at room temperature

    International Nuclear Information System (INIS)

    Choi, Sun Hee; Kim, Joosun; Yoon, Young Soo

    2005-01-01

    Vanadium oxide thin films were grown at room temperature by direct current reactive sputtering. To investigate the effect of plasma immersion on the crystallinity of as-grown film, we immersed samples in plasma during the deposition process. X-ray diffraction (XRD) measurements show that as-deposited thin films immersed in plasma are crystalline, whereas those not immersed in the plasma are amorphous. Images taken with scanning electron microscopy show that the surface of films exposed to plasma have a different morphology to the surface of films not exposed to plasma. The Li-intercalation feature of as-deposited films immersed in plasma shows the typical behavior of crystalline vanadium oxide; such behavior is unsuitable for the cathode of thin film batteries (TFBs). These results indicate that direct current plasma promotes the growth of crystalline vanadium oxide films

  2. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Zhu Lin

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error m≥0. The former even may be only about one half of the latter as long as m=0

  3. Sputtering of neutral and ionic indium clusters

    International Nuclear Information System (INIS)

    Ma, Z.; Coon, S.R.; Calaway, W.F.; Pellin, M.J.; Gruen, D.M.; Von Nagy-Felsobuki, E.I.

    1993-01-01

    Secondary neutral and secondary ion cluster yields were measured during the sputtering of a polycrystalline indium surface by normally incident ∼4 keV Ar + ions. In the secondary neutral mass spectra, indium clusters as large as In 32 were observed. In the secondary ion mass spectra, indium clusters up to In 18 + were recorded. Cluster yields obtained from both the neutral and ion channel exhibited a power law dependence on the number of constituent atoms, n, in the cluster, with the exponents measured to be -5.6 and -4. 1, respectively. An abundance drop was observed at n=8, 15, and 16 in both the neutral and ion yield distributions suggesting that the stability of the ion (either secondary ion or photoion) plays a significant role in the observed distributions. In addition, our experiments suggest that unimolecular decomposition of the neutral cluster may also plays an important role in the measured yield distributions

  4. Laser micromachining of sputtered DLC films

    International Nuclear Information System (INIS)

    Fu, Y.Q.; Luo, J.K.; Flewitt, A.J.; Ong, S.E.; Zhang, S.; Milne, W.I.

    2006-01-01

    DLC films with different thicknesses (from 100 nm to 1.9 μm) were deposited using sputtering of graphite target in pure argon atmosphere without substrate heating. Film microstructures (sp 2 /sp 3 ratio) and mechanical properties (modulus, hardness, stress) were characterized as a function of film thickness. A thin layer of aluminum about 60 nm was deposited on the DLC film surface. Laser micromachining of Al/DLC layer was performed to form microcantilever structures, which were released using a reactive ion etching system with SF 6 plasma. Due to the intrinsic stress in DLC films and bimorph Al/DLC structure, the microcantilevers bent up with different curvatures. For DLC film of 100 nm thick, the cantilever even formed microtubes. The relationship between the bimorph beam bending and DLC film properties (such as stress, modulus, etc.) were discussed in details

  5. Magnetostrictive thin films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Carabias, I.; Martinez, A.; Garcia, M.A.; Pina, E.; Gonzalez, J.M.; Hernando, A.; Crespo, P.

    2005-01-01

    Fe 80 B 20 thin films have been prepared by ion beam sputtering magnetron on room temperature. The films were fabricated on different substrates to compare the different magnetic and structural properties. In particular the growth of films on flexible substrates (PDMS, Kapton) has been studied to allow a simple integration of the system in miniaturized magnetostrictive devices. X-ray diffraction patterns indicate that films are mainly amorphous although the presence of some Fe nanoparticles cannot be ruled out. The coercive field of thin films ranges between 15 and 35 Oe, depending on substrate. Magnetostriction measurements indicate the strong dependence of the saturation magnetostriction with the substrate. Samples on flexible substrates exhibit a better performance than samples deposited onto glass substrates

  6. Beryllium electrodeposition on aluminium cathode from chloride melts

    International Nuclear Information System (INIS)

    Nichkov, I.F.; Novikov, E.A.; Serebryakov, G.A.; Kanashin, Yu.P.; Sardyko, G.N.

    1980-01-01

    Cathodic processes during beryllium deposition on liquid and solid aluminium cathodes are investigated. Mixture of sodium, potassium and beryllium chloride melts served as an lectrolyte. Beryllium ion discharge at the expense of alloy formation takes place at more positive potentials than on an indifferent cathode at low current densities ( in the case of liquid aluminium cathode). Metallographic analysis and measurements of microhardness have shown, that the cathodic product includes two phases: beryllium solid solution in aluminium and metallic beryllium. It is concluded, that aluminium-beryllium alloys with high cathodic yield by current can be obtained by the electrolytic method

  7. Fuzzy tungsten in a magnetron sputtering device

    Energy Technology Data Exchange (ETDEWEB)

    Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)

    2016-11-15

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  8. Fuzzy tungsten in a magnetron sputtering device

    International Nuclear Information System (INIS)

    Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.

    2016-01-01

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24  m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24  m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  9. Comparison of hollow cathode discharge plasma configurations

    International Nuclear Information System (INIS)

    Farnell, Casey C; Farnell, Cody C; Williams, John D

    2011-01-01

    Hollow cathodes used in plasma contactor and electric propulsion devices provide electrons for sustaining plasma discharges and enabling plasma bridge neutralization. Life tests show erosion on hollow cathodes exposed to the plasma environment produced in the region downstream of these devices. To explain the observed erosion, plasma flow field measurements are presented for hollow cathode generated plasmas using both directly immersed probes and remotely located plasma diagnostics. Measurements on two cathode discharge configurations are presented: (1) an open, no magnetic field configuration and (2) a setup simulating the discharge chamber environment of an ion thruster. In the open cathode configuration, large amplitude plasma potential oscillations, ranging from 20 to 85 V within a 34 V discharge, were observed using a fast response emissive probe. These oscillations were observed over a dc potential profile that included a well-defined potential hill structure. A remotely located electrostatic analyzer (ESA) was used to measure the energy of ions produced within the plasma, and energies were detected that met, and in some cases exceeded, the peak oscillatory plasma potentials detected by the emissive probe. In the ion thruster discharge chamber configuration, plasma potentials from the emissive probe again agreed with ion energies recorded by the remotely located ESA; however, much lower ion energies were detected compared with the open configuration. A simplified ion-transit model that uses temporal and spatial plasma property measurements is presented and used to predict far-field plasma streaming properties. Comparisons between the model and remote measurements are presented.

  10. Investigations Of A Pulsed Cathodic Vacuum Arc

    Science.gov (United States)

    Oates, T. W. H.; Pigott, J.; Denniss, P.; Mckenzie, D. R.; Bilek, M. M. M.

    2003-06-01

    Cathodic vacuum arcs are well established as a method for producing thin films for coatings and as a source of metal ions. Research into DC vacuum arcs has been going on for over ten years in the School of Physics at the University of Sydney. Recently a project was undertaken in the school to design and build a pulsed CVA for use in the investigation of plasma sheaths and plasma immersion ion implantation. Pulsed cathodic vacuum arcs generally have a higher current and plasma density and also provide a more stable and reproducible plasma density than their DC counterparts. Additionally it has been shown that if a high repetition frequency can be established the deposition rate of pulsed arcs is equal to or greater than that of DC arcs with a concomitant reduction in the rate of macro-particle formation. We present here results of our investigations into the building of a center-triggered pulsed cathodic vacuum arc. The design of the power supply and trigger mechanism and the geometry of the anode and cathode are examined. Observations of type I and II arc spots using a CCD camera, and cathode spot velocity dependence on arc current will be presented. The role of retrograde motion in a high current pulsed arc is discussed.

  11. Manganese Dioxide As Rechargeable Magnesium Battery Cathode

    International Nuclear Information System (INIS)

    Ling, Chen; Zhang, Ruigang

    2017-01-01

    Rechargeable magnesium battery (rMB) has received increased attention as a promising alternative to current Li-ion technology. However, the lack of appropriate cathode that provides high-energy density and good sustainability greatly hinders the development of practical rMBs. To date, the successful Mg 2+ -intercalation was only achieved in only a few cathode hosts, one of which is manganese dioxide. This review summarizes the research activity of studying MnO 2 in magnesium cells. In recent years, the cathodic performance of MnO 2 was impressively improved to the capacity of >150–200 mAh g −1 at voltage of 2.6–2.8 V with cyclability to hundreds or more cycles. In addition to reviewing electrochemical performance, we sketch a mechanistic picture to show how the fundamental understanding about MnO 2 cathode has been changed and how it paved the road to the improvement of cathode performance.

  12. Manganese Dioxide As Rechargeable Magnesium Battery Cathode

    Energy Technology Data Exchange (ETDEWEB)

    Ling, Chen, E-mail: chen.ling@toyota.com; Zhang, Ruigang [Toyota Research Institute of North America, Ann Arbor, MI (United States)

    2017-11-03

    Rechargeable magnesium battery (rMB) has received increased attention as a promising alternative to current Li-ion technology. However, the lack of appropriate cathode that provides high-energy density and good sustainability greatly hinders the development of practical rMBs. To date, the successful Mg{sup 2+}-intercalation was only achieved in only a few cathode hosts, one of which is manganese dioxide. This review summarizes the research activity of studying MnO{sub 2} in magnesium cells. In recent years, the cathodic performance of MnO{sub 2} was impressively improved to the capacity of >150–200 mAh g{sup −1} at voltage of 2.6–2.8 V with cyclability to hundreds or more cycles. In addition to reviewing electrochemical performance, we sketch a mechanistic picture to show how the fundamental understanding about MnO{sub 2} cathode has been changed and how it paved the road to the improvement of cathode performance.

  13. Investigations Of A Pulsed Cathodic Vacuum Arc

    International Nuclear Information System (INIS)

    Oates, T.W.H.; Pigott, J.; Denniss, P.; Mckenzie, D.R.; Bilek, M.M.M.

    2003-01-01

    Cathodic vacuum arcs are well established as a method for producing thin films for coatings and as a source of metal ions. Research into DC vacuum arcs has been going on for over ten years in the School of Physics at the University of Sydney. Recently a project was undertaken in the school to design and build a pulsed CVA for use in the investigation of plasma sheaths and plasma immersion ion implantation. Pulsed cathodic vacuum arcs generally have a higher current and plasma density and also provide a more stable and reproducible plasma density than their DC counterparts. Additionally it has been shown that if a high repetition frequency can be established the deposition rate of pulsed arcs is equal to or greater than that of DC arcs with a concomitant reduction in the rate of macro-particle formation. We present here results of our investigations into the building of a center-triggered pulsed cathodic vacuum arc. The design of the power supply and trigger mechanism and the geometry of the anode and cathode are examined. Observations of type I and II arc spots using a CCD camera, and cathode spot velocity dependence on arc current will be presented. The role of retrograde motion in a high current pulsed arc is discussed

  14. Structure adhesion and corrosion resistance study of tungsten bisulfide doped with titanium deposited by DC magnetron co-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    De La Roche, J. [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); González, J.M. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Restrepo-Parra, E., E-mail: erestrepop@unal.edu.co [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); Sequeda, F. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Alleh, V.; Scharf, T.W. [The University of North Texas, Department of Materials Science and Engineering, Denton, TX 76203 (United States)

    2014-11-30

    Highlights: • Ti-doped WS{sub 2} films were grown via the magnetron co-sputtering technique. • At a high Ti percentage, the crystalline structure of WS{sub 2} coatings tends to be amorphous. • As the Ti percentage increases in WS{sub 2} coatings, nanocomposites tend to form. • Ti-doped WS{sub 2} films have elastic behavior compared with the plastic response of pure WS{sub 2} films. • A high Ti percentage increases the corrosion resistance of WS{sub 2} films. - Abstract: Titanium-doped tungsten bisulfide thin films (WS{sub 2}-Ti) were grown using a DC magnetron co-sputtering technique on AISI 304 stainless steel and silicon substrates. The films were produced by varying the Ti cathode power from 0 to 25 W. Using energy dispersive spectroscopy (EDS), the concentration of Ti in the WS{sub 2} was determined, and a maximum of 10% was obtained for the sample grown at 25 W. Moreover, the S/W ratio was calculated and determined to increase as a function of the Ti cathode power. According to transmission electron microscopy (TEM) results, at high titanium concentrations (greater than 6%), nanocomposite formation was observed, with nanocrystals of Ti embedded in an amorphous matrix of WS{sub 2}. Using the scratch test, the coatings’ adhesion was analyzed, and it was observed that as the Ti percentage was increased, the critical load (Lc) also increased. Furthermore, the failure type changed from plastic to elastic. Finally, the corrosion resistance was evaluated using the electrochemical impedance spectroscopy (EIS) technique, and it was observed that at high Ti concentrations, the corrosion resistance was improved, as Ti facilitates coating densification and generates a protective layer.

  15. The influence of cathode excavation of cathodic arc evaporator on thickness uniformity and erosion products angle distribution

    Directory of Open Access Journals (Sweden)

    D. V. Duhopel'nikov

    2014-01-01

    Full Text Available Cathodic arc evaporators are used for coating with functional films. Prolonged or buttend evaporators may be used for this purposes. In butt-end evaporator the cathode spots move continuously on the cathode work surface and evaporate cathode material. High depth excavation profile forms on the cathode work surface while the thick coating precipitation (tens or hundreds of microns. The cathode excavation profile is shaped like a “cup” with high walls for electrostatic discharge stabilization systems with axial magnetic fields. Cathode spots move on the bottom of the “cup”. It is very likely that high “cup” walls are formed as a result of lasting work time influence on the uniformity of precipitated films.In the present work the influence of excavation profile walls height on the uniformity of precipitated coating was carried out. The high profile walls are formed due to lasting work of DC vacuum arc evaporator. The cathode material used for tests was 3003 aluminum alloy. The extended substrate was placed parallel to the cathode work surface. Thickness distribution along the substrate length with the new cathode was obtained after 6 hours and after 12 hours of continuous operation.The thickness distribution of precipitated coating showed that the cathode excavation has an influence on the angular distribution of the matter escaping the cathode. It can be clearly seen from the normalized dependence coating thickness vs the distance from the substrate center. Also the angular distribution of the matter flow from the cathode depending on the cathode working time was obtained. It was shown that matter flow from the cathode differs from the LambertKnudsen law. The more the cathode excavation the more this difference.So, cathode excavation profile has an influence on the uniformity of precipitated coating and it is necessary to take in account the cathode excavation profile while coating the thick films.

  16. Oxide cathodes produced by plasma deposition

    International Nuclear Information System (INIS)

    Scheitrum, G.; Caryotakis, G.; Pi, T.; Umstattd, R.; Brown, I.; Montiero, O.

    1997-01-01

    These are two distinct applications for high-current-density, long-life thermionic cathodes. The first application is as a substitute for explosive emission cathodes used in high-power microwave (HPM) devices being developed for Air Force programs. The second application is in SLAC's X-band klystrons for the Next Linear Collider (NLC). SLAC, UCD, and LBL are developing a plasma deposition process that eliminates the problems with binders, carbonate reduction, peeling, and porosity. The emission layer is deposited using plasma deposition of metallic barium in vacuum with an oxygen background gas. An applied bias voltage drives the oxide plasma into the nickel surface. Since the oxide is deposited directly, it does not have problems with poisoning from a hydrocarbon binder. The density of the oxide layer is increased from the 40--50% for standard oxide cathodes to nearly 100% for plasma deposition

  17. Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions

    International Nuclear Information System (INIS)

    Anders, Andre

    2008-01-01

    Self-sputtering runaway in high power impulse magnetron sputtering is closely related to the appearance of multiply charged ions. This conclusion is based on the properties of potential emission of secondary electrons and energy balance considerations. The effect is especially strong for materials whose sputtering yield is marginally greater than unity. The absolute deposition rate increases ∼Q 1/2 , whereas the rate normalized to the average power decreases ∼Q -1/2 , with Q being the mean ion charge state number

  18. Synchrotron Investigations of SOFC Cathode Degradation

    Energy Technology Data Exchange (ETDEWEB)

    Idzerda, Yves

    2013-09-30

    The atomic variations occurring in cathode/electrolyte interface regions of La{sub 1-x}Sr{sub x}Co{sub y}Fe{sub 1-y}O{sub 3-δ} (LSCF) cathodes and other SOFC related materials have been investigated and characterized using soft X-ray Absorption Spectroscopy (XAS) and diffuse soft X-ray Resonant Scattering (XRS). X-ray Absorption Spectroscopy in the soft X-ray region (soft XAS) is shown to be a sensitive technique to quantify the disruption that occurs and can be used to suggest a concrete mechanism for the degradation. For LSC, LSF, and LSCF films, a significant degradation mechanism is shown to be Sr out-diffusion. By using the XAS spectra of hexavalent Cr in SrCrO4 and trivalent Cr in Cr2O3, the driving factor for Sr segregation was identified to be the oxygen vacancy concentration at the anode and cathode side of of symmetric LSCF/GDC/LSCF heterostructures. This is direct evidence of vacancy induced cation diffusion and is shown to be a significant indicator of cathode/electrolyte interfacial degradation. X-ray absorption spectroscopy is used to identify the occupation of the A-sites and B-sites for LSC, LSF, and LSCF cathodes doped with other transition metals, including doping induced migration of Sr to the anti-site for Sr, a significant cathode degradation indicator. By using spatially resolved valence mapping of Co, a complete picture of the surface electrochemistry can be determined. This is especially important in identifying degradation phenomena where the degradation is spatially localized to the extremities of the electrochemistry and not the average. For samples that have electrochemical parameters that are measured to be spatially uniform, the Co valence modifications were correlated to the effects of current density, overpotential, and humidity.

  19. On the microstructure and interfacial properties of sputtered nickel ...

    Indian Academy of Sciences (India)

    Administrator

    On the microstructure and interfacial properties of sputtered nickel ... (FE-SEM) and atomic force microscope (AFM) revealed columnar morphology with voided boundaries for ..... compound phase formation by performing the deposition.

  20. Sputter-Resistant Materials for Electric Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using electric...

  1. Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Yonggi; Kim, Bomsok; Lee, Jaesang [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

    2013-05-15

    Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances.

  2. Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition

    International Nuclear Information System (INIS)

    Kim, Yonggi; Kim, Bomsok; Lee, Jaesang

    2013-01-01

    Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances

  3. Antibacterial properties of palladium nanostructures sputtered on polyethylene naphthalate

    Czech Academy of Sciences Publication Activity Database

    Polívková, M.; Válová, M.; Siegel, J.; Rimpelová, S.; Hubáček, Tomáš; Lyutakov, O.; Švorčík, V.

    2015-01-01

    Roč. 5, č. 90 (2015), s. 73767-73774 ISSN 2046-2069 Institutional support: RVO:60077344 Keywords : polymer * palladium sputtering * annealing * nanostructure * antibacterial effect Subject RIV: JJ - Other Materials Impact factor: 3.289, year: 2015

  4. Sputtering of nano-grains by energetic ions

    CERN Document Server

    Bringa, E M

    2002-01-01

    Sputtering from grains with a size of tens of nanometers is important in a number of astrophysical environments having a variety of plasma properties and can have applications in nano-technology. Since energy deposition by incident ions or electrons can create 'hot' regions in a small grain, thermal spike (TS) models have been applied to estimate the sputtering. The excitations produced by a fast ion are often assumed to form a 'hot' cylindrical track. In this paper we use molecular dynamics (MD) calculations to describe the energy transport and sputtering due to the creation of a 'hot' track in a grain with one quarter million atoms. We show the enhancement due to grain size and find that TS models work over a limited range of excitation densities. Discrepancies of several orders of magnitude are found when comparing our MD results for sputtering of small dust grains to those obtained by the astrophysical community using spike models.

  5. Nanopatterning of swinging substrates by ion-beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Yoon, Sun Mi; Kim, J.-S., E-mail: jskim@sm.ac.kr [Department of Physics, Sookmyung Women' s University, Seoul 140-742 (Korea, Republic of)

    2016-05-28

    Graphite substrates are azimuthally swung during ion-beam sputtering (IBS) at a polar angle θ = 78° from the surface normal. The swinging of the substrate not only causes quasi-two-dimensional mass transport but also makes various sputter effects from the different incident angles to work together. Through variation of the swing angle, both the transport and sputtering effects synergistically produce a series of salient patterns, such as asymmetric wall-like structures, which can grow to several tens of nanometers and exhibit a re-entrant orientational change with the increased swing angle. Thus, the present work demonstrates that dynamic variables such as the swing angle, which have been little utilized, offer an additional parameter space that can be exploited to diversify the sputtered patterns, thereby expanding the applicability of an IBS as well as the comprehension of the IBS nano patterning mechanism.

  6. Development of ion beam sputtering techniques for actinide target preparation

    International Nuclear Information System (INIS)

    Aaron, W.S.; Zevenbergen, L.A.; Adair, H.L.

    1985-01-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed. (orig.)

  7. Sputtering of Au induced by single Xe ion impacts

    International Nuclear Information System (INIS)

    Birtcher, R. C.; Donnelly, S. E.

    1999-01-01

    Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry

  8. Electronic sputtering of biomolecules and its application in mass spectrometry

    International Nuclear Information System (INIS)

    Haakansson, P.; Sundqvist, B.U.R.

    1989-01-01

    In 1974 Macfarlane discovered that fast heavy ions from a 252-Cf source can desorb and ionize molecules from a solid surface. The mass of the molecules was determined by time-of-flight technique. It has been shown that the desorption mechanism is associated with the electron part of the stopping power of the primary ion and the name 'electron sputtering' has been adopted for the phenomenon to distinguish it from the well-known sputtering process with ions of KeV energy. A review of electronic sputtering of biomolecules will be given as well as recent measurements on Langmuir-Blodgett films. One important application of electronic sputtering is in the field of mass spectrometry. With this technique large and nonvolatile molecules can be studied. Particularly adsorption of biomolecules to a nitrocellulose backing has proven to be very useful. Examples will be given of mass spectra from peptides with a molecular weight above 20,000 u. (author)

  9. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    TECS

    Gas sensitivity; ZnO; sputtering; XRD patterns; structure; thin films. 1. Introduction. Because zinc ... voltage and absorption properties of those fabricated films have been ... tations are useful in many physical applications. The in- plane (Hegde ...

  10. Sputtering mechanisms of polycrystalline platinum by low energy ions

    International Nuclear Information System (INIS)

    Chernysh, V.S.; Eckstein, W.; Haidarov, A.A.; Kulikauskas, V.S.; Mashkova, E.S.; Molchanov, V.A.

    1999-01-01

    The results of an experimental study and a computer simulation with the TRIM.SP code of the angular distributions of atoms sputtered from polycrystalline platinum under 1.5-9 keV He + bombardment at the normal ion incidence are presented. It has been found that angular distributions of sputtered atoms are overcosine and that their shape is practically independent of the bombarding ion species and ion energy. Good agreement between experimental results and computer simulation data was found. Computer simulations of the partial angular distributions of Pt atoms ejected due to various sputtering mechanisms for He and Ar bombardments were performed. The role of different mechanisms in the formation of angular distributions of sputtered atoms has been analyzed

  11. Sputtering of two-phase AgxCuγ alloys

    International Nuclear Information System (INIS)

    Bibic, N.; Milosavljevic, M.; Perusko, D.; Wilson, I.H.

    1992-01-01

    Elemental sputtering yields from two phase AgCu alloys were measured for 20, 40 and 50 at % Ag. Argon ion bombardment energies were in the range 35-55 keV and the ion dose was 1 x 10 19 ions cm -2 . The sputtering yield for silver was found to be considerably below what was expected by simple selective sputtering of a two component alloy. Analysis by electron probe X-ray microanalysis and scanning electron microscopy of the eroded surface indicated that surface diffusion of copper from copper rich grains and geometrical constraints in the dense cone forest on Cu/Ag eutectic regions combine to reduce the sputtering yield for silver. (author)

  12. Nanopatterning of swinging substrates by ion-beam sputtering

    International Nuclear Information System (INIS)

    Yoon, Sun Mi; Kim, J.-S.

    2016-01-01

    Graphite substrates are azimuthally swung during ion-beam sputtering (IBS) at a polar angle θ = 78° from the surface normal. The swinging of the substrate not only causes quasi-two-dimensional mass transport but also makes various sputter effects from the different incident angles to work together. Through variation of the swing angle, both the transport and sputtering effects synergistically produce a series of salient patterns, such as asymmetric wall-like structures, which can grow to several tens of nanometers and exhibit a re-entrant orientational change with the increased swing angle. Thus, the present work demonstrates that dynamic variables such as the swing angle, which have been little utilized, offer an additional parameter space that can be exploited to diversify the sputtered patterns, thereby expanding the applicability of an IBS as well as the comprehension of the IBS nano patterning mechanism.

  13. Ferroelectric Cathodes in Transverse Magnetic Fields

    International Nuclear Information System (INIS)

    Alexander Dunaevsky; Yevgeny Raitses; Nathaniel J. Fisch

    2002-01-01

    Experimental investigations of a planar ferroelectric cathode in a transverse magnetic field up to 3 kGs are presented. It is shown that the transverse magnetic field affects differently the operation of ferroelectric plasma cathodes in ''bright'' and ''dark'' modes in vacuum. In the ''bright'' mode, when the surface plasma is formed, the application of the transverse magnetic field leads to an increase of the surface plasma density. In the ''dark'' mode, the magnetic field inhibits the development of electron avalanches along the surface, as it does similarly in other kinds of surface discharges in the pre-breakdown mode

  14. Cathode architectures for alkali metal / oxygen batteries

    Science.gov (United States)

    Visco, Steven J; Nimon, Vitaliy; De Jonghe, Lutgard C; Volfkovich, Yury; Bograchev, Daniil

    2015-01-13

    Electrochemical energy storage devices, such as alkali metal-oxygen battery cells (e.g., non-aqueous lithium-air cells), have a cathode architecture with a porous structure and pore composition that is tailored to improve cell performance, especially as it pertains to one or more of the discharge/charge rate, cycle life, and delivered ampere-hour capacity. A porous cathode architecture having a pore volume that is derived from pores of varying radii wherein the pore size distribution is tailored as a function of the architecture thickness is one way to achieve one or more of the aforementioned cell performance improvements.

  15. Studies on pulsed hollow cathode capillary discharges

    Energy Technology Data Exchange (ETDEWEB)

    Choi, P; Dumitrescu-Zoita, C; Larour, J; Rous, J [Ecole Polytechnique, 91 - Palaiseau (France). Lab. de Physique des Milieux Ionises; Favre, M; Moreno, J; Chuaqui, H; Wyndham, E [Pontificia Univ. Catolica de Chile, Santiago (Chile). Facultad de Fisica; Zambra, M [Comision Chilena de Energia Nuclear, Santiago (Chile); Wong, C S [Univ. of Malaya, Kuala Lumpur (Malaysia). Plasma Research Lab

    1997-12-31

    Preliminary results on radiation characteristics of pulsed hollow cathode capillary discharges are presented. The device combines the on axis electron beam assisted ionization capabilities of the transient hollow cathode discharge with a novel high voltage low inductance geometrical design, which integrates the local energy storage into the electrode system. A nanosecond regime high temperature plasma is produced in a long, high aspect ratio capillary, with light emission in the UV to XUV region. The discharge is operated from near vacuum to pressure in the 1000 mTorr range. (author). 2 figs., 7 refs.

  16. DARHT 2 kA Cathode Development

    Energy Technology Data Exchange (ETDEWEB)

    Henestroza, E.; Houck, T.; Kwan, J.W.; Leitner, M.; Miram, G.; Prichard, B.; Roy, P.K.; Waldron, W.; Westenskow, G.; Yu, S.; Bieniosek, F.M.

    2009-03-09

    In the campaign to achieve 2 kA of electron beam current, we have made several changes to the DARHT-II injector during 2006-2007. These changes resulted in a significant increase in the beam current, achieving the 2 kA milestone. Until recently (before 2007), the maximum beam current that was produced from the 6.5-inch diameter (612M) cathode was about 1300 A when the cathode was operating at a maximum temperature of 1140 C. At this temperature level, the heat loss was dominated by radiation which is proportional to temperature to the fourth power. The maximum operating temperature was limited by the damage threshold of the potted filament and the capacity of the filament heater power supply, as well as the shortening of the cathode life time. There were also signs of overheating at other components in the cathode assembly. Thus it was clear that our approach to increase beam current could not be simply trying to run at a higher temperature and the preferred way was to operate with a cathode that has a lower work function. The dispenser cathode initially used was the type 612M made by SpectraMat. According to the manufacturer's bulletin, this cathode should be able to produce more than 10 A/cm{sup 2} of current density (corresponding to 2 kA of total beam current) at our operating conditions. Instead the measured emission (space charge limited) was 6 A/cm{sup 2}. The result was similar even after we had revised the activation and handling procedures to adhere more closely to the recommend steps (taking longer time and nonstop to do the out-gassing). Vacuum was a major concern in considering the cathode's performance. Although the vacuum gauges at the injector vessel indicated 10{sup -8} Torr, the actual vacuum condition near the cathode in the central region of the vessel, where there might be significant out-gassing from the heater region, was never determined. Poor vacuum at the surface of the cathode degraded the emission (by raising the work function

  17. DARHT 2 kA Cathode Development

    International Nuclear Information System (INIS)

    Henestroza, E.; Houck, T.; Kwan, J.W.; Leitner, M.; Miram, G.; Prichard, B.; Roy, P.K.; Waldron, W.; Westenskow, G.; Yu, S.; Bieniosek, F.M.

    2009-01-01

    In the campaign to achieve 2 kA of electron beam current, we have made several changes to the DARHT-II injector during 2006-2007. These changes resulted in a significant increase in the beam current, achieving the 2 kA milestone. Until recently (before 2007), the maximum beam current that was produced from the 6.5-inch diameter (612M) cathode was about 1300 A when the cathode was operating at a maximum temperature of 1140 C. At this temperature level, the heat loss was dominated by radiation which is proportional to temperature to the fourth power. The maximum operating temperature was limited by the damage threshold of the potted filament and the capacity of the filament heater power supply, as well as the shortening of the cathode life time. There were also signs of overheating at other components in the cathode assembly. Thus it was clear that our approach to increase beam current could not be simply trying to run at a higher temperature and the preferred way was to operate with a cathode that has a lower work function. The dispenser cathode initially used was the type 612M made by SpectraMat. According to the manufacturer's bulletin, this cathode should be able to produce more than 10 A/cm 2 of current density (corresponding to 2 kA of total beam current) at our operating conditions. Instead the measured emission (space charge limited) was 6 A/cm 2 . The result was similar even after we had revised the activation and handling procedures to adhere more closely to the recommend steps (taking longer time and nonstop to do the out-gassing). Vacuum was a major concern in considering the cathode's performance. Although the vacuum gauges at the injector vessel indicated 10 -8 Torr, the actual vacuum condition near the cathode in the central region of the vessel, where there might be significant out-gassing from the heater region, was never determined. Poor vacuum at the surface of the cathode degraded the emission (by raising the work function value). We reexamined

  18. Magnetospheric ion sputtering and water ice grain size at Europa

    Science.gov (United States)

    Cassidy, T. A.; Paranicas, C. P.; Shirley, J. H.; Dalton, J. B., III; Teolis, B. D.; Johnson, R. E.; Kamp, L.; Hendrix, A. R.

    2013-03-01

    We present the first calculation of Europa's sputtering (ion erosion) rate as a function of position on Europa's surface. We find a global sputtering rate of 2×1027 H2O s-1, some of which leaves the surface in the form of O2 and H2. The calculated O2 production rate is 1×1026 O2 s-1, H2 production is twice that value. The total sputtering rate (including all species) peaks at the trailing hemisphere apex and decreases to about 1/3rd of the peak value at the leading hemisphere apex. O2 and H2 sputtering, by contrast, is confined almost entirely to the trailing hemisphere. Most sputtering is done by energetic sulfur ions (100s of keV to MeV), but most of the O2 and H2 production is done by cold oxygen ions (temperature ∼ 100 eV, total energy ∼ 500 eV). As a part of the sputtering rate calculation we compared experimental sputtering yields with analytic estimates. We found that the experimental data are well approximated by the expressions of Famá et al. for ions with energies less than 100 keV (Famá, M., Shi, J., Baragiola, R.A., 2008. Sputtering of ice by low-energy ions. Surf. Sci. 602, 156-161), while the expressions from Johnson et al. fit the data best at higher energies (Johnson, R.E., Burger, M.H., Cassidy, T.A., Leblanc, F., Marconi, M., Smyth, W.H., 2009. Composition and Detection of Europa's Sputter-Induced Atmosphere, in: Pappalardo, R.T., McKinnon, W.B., Khurana, K.K. (Eds.), Europa. University of Arizona Press, Tucson.). We compare the calculated sputtering rate with estimates of water ice regolith grain size as estimated from Galileo Near-Infrared Mapping Spectrometer (NIMS) data, and find that they are strongly correlated as previously suggested by Clark et al. (Clark, R.N., Fanale, F.P., Zent, A.P., 1983. Frost grain size metamorphism: Implications for remote sensing of planetary surfaces. Icarus 56, 233-245.). The mechanism responsible for the sputtering rate/grain size link is uncertain. We also report a surface composition estimate using

  19. Cathode characterization system: preliminary results with (Ba,Sr,Ca) O coated cathodes

    International Nuclear Information System (INIS)

    Nono, M.C.A.; Goncalves, J.A.N.; Barroso, J.J.; Dallaqua, R.S.; Spassovsky, I.

    1993-01-01

    The performance of a cathode characterization system for studying the emission parameters of thermal electron emitters is reported. The system consists of vacuum chamber, power supplies and equipment for measuring and control. Measurements have been taken of the emission current as function of cathode temperature and anode voltage. Several (Ba, Sr) O coated cathodes were tested and the results have shown good agreement with Child's and Richardson's laws. The experimental work function is between 1.0 and 2.0 e V. All emission parameters measured are consistent with international literature data. (author)

  20. A Novel Cathode Material for Cathodic Dehalogenation of 1,1-Dibromo Cyclopropane Derivatives.

    Science.gov (United States)

    Gütz, Christoph; Selt, Maximilian; Bänziger, Markus; Bucher, Christoph; Römelt, Christina; Hecken, Nadine; Gallou, Fabrice; Galvão, Tomás R; Waldvogel, Siegfried R

    2015-09-28

    Leaded bronze turned out to be an excellent cathode material for the dehalogenation reaction of cyclopropanes without affecting the strained molecular entity. With this particular alloy, beneficial properties of lead cathodes are conserved, whereas the corrosion of cathode is efficiently suppressed. The solvent in the electrolyte determines whether a complete debromination reaction is achieved or if the process can be selectively stopped at the monobromo cyclopropane intermediate. The electroorganic conversion tolerates a variety of functional groups and can be conducted at rather complex substrates like cyclosporine A. This approach allows the sustainable preparation of cyclopropane derivatives. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  1. Li- and Mn-Rich Cathode Materials: Challenges to Commercialization

    Energy Technology Data Exchange (ETDEWEB)

    Zheng, Jianming [Energy and Environmental Directorate, Pacific Northwest National Laboratory, 902 Battelle Boulevard Richland WA 99354 USA; Myeong, Seungjun [School of Energy and Chemical Engineering, Green Energy Materials Development Center, Ulsan National Institute of Science and Technology (UNIST), Korea 689-798; Cho, Woongrae [School of Energy and Chemical Engineering, Green Energy Materials Development Center, Ulsan National Institute of Science and Technology (UNIST), Korea 689-798; Yan, Pengfei [Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, 902 Battelle Boulevard Richland WA 99354 USA; Xiao, Jie [Energy and Environmental Directorate, Pacific Northwest National Laboratory, 902 Battelle Boulevard Richland WA 99354 USA; Wang, Chongmin [Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, 902 Battelle Boulevard Richland WA 99354 USA; Cho, Jaephil [School of Energy and Chemical Engineering, Green Energy Materials Development Center, Ulsan National Institute of Science and Technology (UNIST), Korea 689-798; Zhang, Ji-Guang [Energy and Environmental Directorate, Pacific Northwest National Laboratory, 902 Battelle Boulevard Richland WA 99354 USA

    2016-12-14

    The lithium- and manganese-rich (LMR) layered structure cathode exhibit one of the highest specific energy (~900 Wh kg-1) among all the cathode materials. However, the practical applications of LMR cathodes are still hindered by several significant challenges including voltage fade, large initial capacity loss, poor rate capability and limited cycle life. Herein, we review the recent progresses and understandings on the application of LMR cathode materials from practical point of view. Several key parameters of LMR cathodes that affect the LMR/graphite full cell operation are systematically analysed. These factors include the first cycle capacity loss, voltage fade, powder tap density, electrode density of LMR based cathode etc. New approaches to minimize the detrimental effect of these factors are highlighted in this work. We also provided the perspectives for the future research on LMR cathode materials, focusing on addressing the fundamental problems of LMR cathodes while always keeping practical considerations in mind.

  2. Reservoir Cathode for Electric Space Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose a hollow reservoir cathode to improve performance in ion and Hall thrusters. We will adapt our existing reservoir cathode technology to this purpose....

  3. Impressed current cathodic protection of deep water structures

    Digital Repository Service at National Institute of Oceanography (India)

    Venkatesan, R.

    that the cathodic protection design approaches for shallow water may not be adequate for deeper water. This paper discusses on environmental factors encountered in deep water and their effect on cathodic protection behaviour of steel. Further, current CP design...

  4. Long Life Cold Cathodes for Hall effect Thrusters, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — An electron source incorporating long life, high current density cold cathodes inside a microchannel plate for use with ion thrusters is proposed. Cathode lifetime...

  5. Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films

    International Nuclear Information System (INIS)

    Stranak, Vitezslav; Hippler, Rainer; Cada, Martin; Hubicka, Zdenek; Tichy, Milan

    2010-01-01

    Time-resolved comparative study of dual magnetron sputtering (dual-MS) and dual high power impulse magnetron sputtering (dual-HiPIMS) systems arranged with closed magnetic field is presented. The dual-MS system was operated with a repetition frequency 4.65 kHz (duty cycle ≅50%). The frequency during dual-HiPIMS is lower as well as its duty cycle (f=100 Hz, duty 1%). Different metallic targets (Ti, Cu) and different cathode voltages were applied to get required stoichiometry of Ti-Cu thin films. The plasma parameters of the interspace between magnetrons in the substrate position were investigated by time-resolved optical emission spectroscopy, Langmuir probe technique, and measurement of ion fluxes to the substrate. It is shown that plasma density as well as ion flux is higher about two orders of magnitude in dual-HiPIMS system. This fact is partially caused by low diffusion of ionized sputtered particles (Ti + ,Cu + ) which creates a preionized medium.

  6. Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-01

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2 kV and a power supply system equipped with 25/50 μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp3/sp2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp3/sp2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed.

  7. Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy.

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-05

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2kV and a power supply system equipped with 25/50μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp 3 /sp 2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp 3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp 3 /sp 2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp 3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed. Copyright © 2018 Elsevier B.V. All rights reserved.

  8. Secondary ion formation during electronic and nuclear sputtering of germanium

    Science.gov (United States)

    Breuer, L.; Ernst, P.; Herder, M.; Meinerzhagen, F.; Bender, M.; Severin, D.; Wucher, A.

    2018-06-01

    Using a time-of-flight mass spectrometer attached to the UNILAC beamline located at the GSI Helmholtz Centre for Heavy Ion Research, we investigate the formation of secondary ions sputtered from a germanium surface under irradiation by swift heavy ions (SHI) such as 5 MeV/u Au by simultaneously recording the mass spectra of the ejected secondary ions and their neutral counterparts. In these experiments, the sputtered neutral material is post-ionized via single photon absorption from a pulsed, intensive VUV laser. After post-ionization, the instrument cannot distinguish between secondary ions and post-ionized neutrals, so that both signals can be directly compared in order to investigate the ionization probability of different sputtered species. In order to facilitate an in-situ comparison with typical nuclear sputtering conditions, the system is also equipped with a conventional rare gas ion source delivering a 5 keV argon ion beam. For a dynamically sputter cleaned surface, it is found that the ionization probability of Ge atoms and Gen clusters ejected under electronic sputtering conditions is by more than an order of magnitude higher than that measured for keV sputtered particles. In addition, the mass spectra obtained under SHI irradiation show prominent signals of GenOm clusters, which are predominantly detected as positive or negative secondary ions. From the m-distribution for a given Ge nuclearity n, one can deduce that the sputtered material must originate from a germanium oxide matrix with approximate GeO stoichiometry, probably due to residual native oxide patches even at the dynamically cleaned surface. The results clearly demonstrate a fundamental difference between the ejection and ionization mechanisms in both cases, which is interpreted in terms of corresponding model calculations.

  9. Simple model of surface roughness for binary collision sputtering simulations

    Energy Technology Data Exchange (ETDEWEB)

    Lindsey, Sloan J. [Institute of Solid-State Electronics, TU Wien, Floragasse 7, A-1040 Wien (Austria); Hobler, Gerhard, E-mail: gerhard.hobler@tuwien.ac.at [Institute of Solid-State Electronics, TU Wien, Floragasse 7, A-1040 Wien (Austria); Maciążek, Dawid; Postawa, Zbigniew [Institute of Physics, Jagiellonian University, ul. Lojasiewicza 11, 30348 Kraków (Poland)

    2017-02-15

    Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.

  10. Simple model of surface roughness for binary collision sputtering simulations

    International Nuclear Information System (INIS)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-01-01

    Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.

  11. Evaluation of residual stress in sputtered tantalum thin-film

    Energy Technology Data Exchange (ETDEWEB)

    Al-masha’al, Asa’ad, E-mail: asaad.al@ed.ac.uk; Bunting, Andrew; Cheung, Rebecca

    2016-05-15

    Highlights: • Tantalum thin-films have been deposited by DC magnetron sputtering system. • Thin-film stress is observed to be strongly influenced by sputtering pressure. • Transition towards the compressive stress is ascribed to the annealing at 300 °C. • Expose thin-film to air ambient or ion bombardment lead to a noticeable change in the residual stress. - Abstract: The influence of deposition conditions on the residual stress of sputtered tantalum thin-film has been evaluated in the present study. Films have been deposited by DC magnetron sputtering and curvature measurement method has been employed to calculate the residual stress of the films. Transitions of tantalum film stress from compressive to tensile state have been observed as the sputtering pressure increases. Also, the effect of annealing process at temperature range of 90–300 °C in oxygen ambient on the residual stress of the films has been studied. The results demonstrate that the residual stress of the films that have been deposited at lower sputtering pressure has become more compressive when annealed at 300 °C. Furthermore, the impact of exposure to atmospheric ambient on the tantalum film stress has been investigated by monitoring the variation of the residual stress of both annealed and unannealed films over time. The as-deposited films have been exposed to pure Argon energy bombardment and as result, a high compressive stress has been developed in the films.

  12. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson

    2000-03-31

    . However, they have the potential of being useful as an interface on the anode side of the electrolyte. NexTech has focused much of its effort during the past few months on establishing tape casting methods for porous LSM substrates. This work, performed under a separate DOE-funded program, involved tape casting formulations comprising LSM powders with bi-modal particle size distributions and fugitive pore forming additives. Sintered LSM substrates with porosities in the 30 to 40 vol% range, and pore sizes of 10 {approx} 20 microns have been prepared. In addition, tape casting formulations involving composite mixtures of LSM and Sm-doped ceria (SDC) have been evaluated. The LSM/SDC cathode substrates are expected to provide better performance at low temperatures. Characterization of these materials is currently underway.

  13. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson; Wayne Huebner; Igor Kosacki

    2001-09-30

    This project has three main goals: Thin Films Studies, Preparation of Graded Porous Substrates and Basic Electrical Characterization and testing of Planar Single Cells. In this portion of study we have focused on producing YSZ films on porous LSM substrates. When using the polymer precursor there are a number of obstacles to overcome in order to form dense electrolyte layers on porous substrates (cathode or anode). Probably the most difficult problems are: (1) Extreme penetration of the polymer into the substrate must be prevented. (2) Shrinkage cracking must be avoided. (3) Film thickness in the 1 to 5{micro}m range must be achieved. We have demonstrated that cracking due to shrinkage involved during the elimination of solvents and organic matter and densification of the remaining oxide is not a problem as long as the resulting oxide film is < {approx} 0.15 {micro}m in thickness. We have also shown that we can make thicker films by making multiple depositions if the substrate is smooth (roughness {le} 0.1 {micro}m) and contains no surface pores > 0.2 {micro}m. The penetration of the polymer into the porous substrate can be minimized by increasing the viscosity of the polymer and reducing the largest pore at the surface of the substrate to {le} 0.2 {micro}m. We have shown that this can be done, but we have also shown that it is difficult to make dense films that are defect free with areas > 1 cm{sup 2}. This is because of the roughness of the substrate and the difficulty in making a substrate which does not have surface voids > 0.2 {micro}m. Thus the process works well for dense, smooth substrates for films < 1 {micro}m thick, but is difficult to apply to rough, porous surfaces and to make film thickness > 1 {micro}m. As a result of these problems, we have been addressing the issue of how to make dense films in the thickness range of 1 to 5 {micro}m on sintered porous substrates without introducing cracks and holes due to shrinkage and surface voids? These

  14. Polymer coatings as separator layers for microbial fuel cell cathodes

    KAUST Repository

    Watson, Valerie J.; Saito, Tomonori; Hickner, Michael A.; Logan, Bruce E.

    2011-01-01

    and increased coulombic efficiency (CE = 56-64%) relative to an uncoated cathode (29 ± 8%), but decreased power production (255-574 mW m-2). Electrochemical characterization of the cathodes ex situ to the MFC showed that the cathodes with the lowest charge

  15. Coating for lithium anode, thionyl chloride active cathode electrochemical cell

    Energy Technology Data Exchange (ETDEWEB)

    Catanzarite, V.O.

    1983-01-04

    Electrochemical power cells having a cathode current collector, a combination liquid active cathode depolarizer electrolyte solvent and an anode that forms surface compounds when in intimate contact with the liquid cathode are enhanced by the addition of a passivation limiting film contiguous to said anode. The passivating film is a member of the cyanoacrilate family of organic compounds.

  16. Coating for lithium anode, thionyl chloride active cathode electrochemical cell

    Energy Technology Data Exchange (ETDEWEB)

    Catanzarite, V.O.

    1981-10-20

    Electrochemical power cells having a cathode current collector, a combination liquid active cathode depolarizer electrolyte solvent and an anode that forms surface compounds when in intimate contact with the liquid cathode are enhanced by the addition of a passivation limiting film contiguous to said anode. The passivating film is a member of the cyanoacrilate family of organic compounds.

  17. Cold cathodes on ultra-dispersed diamond base

    International Nuclear Information System (INIS)

    Alimova, A.N.; Zhirnov, V.V.; Chubun, N.N.; Belobrov, P.I.

    1998-01-01

    Prospects of application of nano diamond powders for fabrication of cold cathodes are discussed.Cold cathodes based on silicon pointed structures with nano diamond coatings were prepared.The deposition technique of diamond coating was dielectrophoresis from suspension of nano diamond powder in organic liquids.The cathodes were tested in sealed prototypes of vacuum electronic devices

  18. Explosive-emission cathode fabricated using track method

    International Nuclear Information System (INIS)

    Akap'ev, G.N.; Korenev, S.A.

    1989-01-01

    Fabrication technique for large area multipoint cathodes is described. The technique is based on channels filling with metal in the ion-irradiated dielectric film producted after channel etching. It is shown, that cathode may be used under explosive emission conditions. Characteristics of diode with the mentioned type cathodes are measured

  19. Zn{sub x}Zr{sub y}O{sub z} thin films grown by DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, O. [Instituto de Ciencia de Materiales de Madrid (CSIC), Madrid (Spain); Hernandez-Velez, M. [Departamento de Fisica Aplicada, Universidad Autonoma de Madrid (Spain)

    2017-10-15

    The structural and optical properties of thin films deposited by DC reactive magnetron co-sputtering using Zn and Zr targets in argon and oxygen gas mixtures at room temperature are reported. The power applied to the Zr cathode was kept constant, while that applied to the Zn cathode was varied between 0 and 150 W to produce very different Zn{sub x}Zr{sub y}O{sub z} ternary compounds with Zn/Zr atomic ratios in the range of 0.1-10. The composition, crystalline structure, and optical properties of the samples were determined by EDX, XRD, FTIR, and UV-visible spectroscopies. The grown films are polycrystalline, and the preferred crystallographic orientation depends on the Zn atomic concentration in the film. The optical transmission in the UV-visible range is approximately 80% in all cases, and as the Zn atomic content increases, the absorption edge shifts to longer wavelengths. The optical band gap, E{sub g}, shifted from 5.5 to 3.5 eV when the Zn/Zr atomic ratio was increased. The results indicate the potential use of these materials in optoelectronic applications. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  20. Thermal Measurement during Electrolysis of Pd-Ni Thin-film -Cathodes in Li2SO4/H2O Solution

    Science.gov (United States)

    Castano, C. H.; Lipson, A. G.; S-O, Kim; Miley, G. H.

    2002-03-01

    Using LENR - open type calorimeters, measurements of excess heat production were carried out during electrolysis in Li_2SO_4/H_2O solution with a Pt-anode and Pd-Ni thin film cathodes (2000-8000 Åthick) sputtered on the different dielectric substrates. In order to accurately evaluate actual performance during electrolysis runs in the open-type calorimeter used, considering effects of heat convection, bubbling and possible H_2+O2 recombination, smooth Pt sheets were used as cathodes. Pt provides a reference since it does not produce excess heat in the light water electrolyte. To increase the accuracy of measurements the water dissociation potential was determined for each cathode taking into account its individual over-voltage value. It is found that this design for the Pd-Ni cathodes resulted in the excess heat production of ~ 20-25 % of input power, equivalent to ~300 mW. In cases of the Pd/Ni- film fracture (or detachment from substrate) no excess heat was detected, providing an added reference point. These experiments plus use of optimized films will be presented.

  1. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  2. RF Photoelectric injectors using needle cathodes

    International Nuclear Information System (INIS)

    Lewellen, J.W.; Brau, C.A.

    2003-01-01

    Photocathode RF guns, in various configurations, are the injectors of choice for both current and future applications requiring high-brightness electron beams. Many of these applications, such as single-pass free-electron lasers, require beams with high brilliance but not necessarily high charge per bunch. Field-enhanced photoelectric emission has demonstrated electron-beam current density as high as 10 10 A/m 2 , with a quantum efficiency in the UV that approaches 10% at fields on the order of 10 10 V/m. Thus, the use of even a blunt needle holds promise for increasing cathode quantum efficiency without sacrificing robustness. We present an initial study on the use of needle cathodes in photoinjectors to enhance beam brightness while reducing beam charge. Benefits include lower drive-laser power requirements, easier multibunch operation, lower emittance, and lower beam degradation due to charge-dependent effects in the postinjector accelerator. These benefits result from a combination of a smaller cathode emission area, greatly enhanced RF field strength at the cathode, and the charge scaling of detrimental postinjector linac effects, e.g., transverse wakefields and CSR

  3. RF Photoelectric injectors using needle cathodes

    Science.gov (United States)

    Lewellen, J. W.; Brau, C. A.

    2003-07-01

    Photocathode RF guns, in various configurations, are the injectors of choice for both current and future applications requiring high-brightness electron beams. Many of these applications, such as single-pass free-electron lasers, require beams with high brilliance but not necessarily high charge per bunch. Field-enhanced photoelectric emission has demonstrated electron-beam current density as high as 10 10 A/m 2, with a quantum efficiency in the UV that approaches 10% at fields on the order of 10 10 V/m. Thus, the use of even a blunt needle holds promise for increasing cathode quantum efficiency without sacrificing robustness. We present an initial study on the use of needle cathodes in photoinjectors to enhance beam brightness while reducing beam charge. Benefits include lower drive-laser power requirements, easier multibunch operation, lower emittance, and lower beam degradation due to charge-dependent effects in the postinjector accelerator. These benefits result from a combination of a smaller cathode emission area, greatly enhanced RF field strength at the cathode, and the charge scaling of detrimental postinjector linac effects, e.g., transverse wakefields and CSR.

  4. Barium depletion in hollow cathode emitters

    International Nuclear Information System (INIS)

    Polk, James E.; Mikellides, Ioannis G.; Katz, Ira; Capece, Angela M.

    2016-01-01

    Dispenser hollow cathodes rely on a consumable supply of Ba released by BaO-CaO-Al 2 O 3 source material in the pores of a tungsten matrix to maintain a low work function surface. The examination of cathode emitters from long duration tests shows deposits of tungsten at the downstream end that appear to block the flow of Ba from the interior. In addition, a numerical model of Ba transport in the cathode plasma indicates that the Ba partial pressure in the insert may exceed the equilibrium vapor pressure of the dominant Ba-producing reaction, and it was postulated previously that this would suppress Ba loss in the upstream part of the emitter. New measurements of the Ba depletion depth from a cathode insert operated for 8200 h reveal that Ba loss is confined to a narrow region near the downstream end, confirming this hypothesis. The Ba transport model was modified to predict the depletion depth with time. A comparison of the calculated and measured depletion depths gives excellent qualitative agreement, and quantitative agreement was obtained assuming an insert temperature 70 °C lower than measured beginning-of-life values

  5. Cathode follower RF system with frequency modulation

    International Nuclear Information System (INIS)

    Irie, Y.; Yano, Y.; Kaneko, N.; Kobayashi, Y.

    1994-01-01

    A model RF system with a cathode follower was tested under frequency modulation in the 1-3.5 MHz range. The repetition rate was 40 Hz. The oscillation was stable, and the output impedance was measured to be around 20 ohm. (author)

  6. Renovation of the cathodic protection system

    NARCIS (Netherlands)

    Schuten, G.; Leggedoor, J.; Polder, R.B.; Peelen, W.H.A.

    2003-01-01

    The first system for Cathodic Protection of concrete in the Netherlands was applied to a one bicycle lane of a bridge suffering corrosion due to de-icing salt penetration in 1986. This CP system was based on the Ferex 100S conducting polymer cable anode in a cementitious overlay. Its functioning was

  7. High-rate sputter deposition of NiAl on sapphire fibers

    Energy Technology Data Exchange (ETDEWEB)

    Reichert, K.; Martinez, C.; Cremer, R.; Neuschuetz, D. [Lehrstuhl fuer Theoretische Huettenkunde, RWTH Aachen, Aachen (Germany)

    2002-07-01

    Once the fiber-matrix bonding has been optimized to meet the different requirements during fabrication and operation of the later composite component, sapphire fiber reinforced NiAl will be a potential candidate to substitute conventional superalloys as structural material for gas turbine blades. To improve the composite fabrication process, a direct deposition of the intermetallic matrix material onto hBN coated sapphire fibers prior to the consolidation of the fiber-matrix composite is proposed. It is believed that this will simplify the fabrication process and prevent pore formation during the diffusion bonding. In addition, the fiber volume fraction can be quite easily adjusted by varying the NiAl coating thickness. For this, a high-rate deposition of NiAl is in any case necessary. It has been achieved by a pulsed DC magnetron sputtering of combined Al-Ni targets with the fibers rotating between the two facing cathodes. The obtained nickel aluminide coatings were analyzed as to structure and composition by means of X-ray (GIXRD) as well as electron diffraction (RHEED) and X-ray photoelectron spectroscopy (XPS), respectively. The morphology of the NiAl coatings was examined by SEM. (orig.)

  8. Non-conventional photocathodes based on Cu thin films deposited on Y substrate by sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Perrone, A. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); National Institute of Nuclear Physics and University of Salento, 73100 Lecce (Italy); D’Elia, M. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); Gontad, F., E-mail: francisco.gontad@le.infn.it [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); National Institute of Nuclear Physics and University of Salento, 73100 Lecce (Italy); Di Giulio, M.; Maruccio, G. [Department of Mathematics and Physics “E. De Giorgi”, University of Salento, 73100 Lecce (Italy); Cola, A. [National Council Research, Institute for Microelectronics and Microsystems, 73100 Lecce (Italy); Stankova, N.E. [Institute of Electronics, Bulgarian Academy of Sciences, 1784 Sofia (Bulgaria); Kovacheva, D.G. [Institute of General and Inorganic Chemistry, Bulgarian Academy of Sciences, 1113 Sofia (Bulgaria); Broitman, E. [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)

    2014-07-01

    Copper (Cu) thin films were deposited on yttrium (Y) substrate by sputtering. During the deposition, a small central area of the Y substrate was shielded to avoid the film deposition and was successively used to study its photoemissive properties. This configuration has two advantages: the cathode presents (i) the quantum efficiency and the work function of Y and (ii) high electrical compatibility when inserted into the conventional radio-frequency gun built with Cu bulk. The photocathode was investigated by scanning electron microscopy to determine surface morphology. X-ray diffraction and atomic force microscopy studies were performed to compare the structure and surface properties of the deposited film. The measured electrical resistivity value of the Cu film was similar to that of high purity Cu bulk. Film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Finally, the photoelectron performance in terms of quantum efficiency was obtained in a high vacuum photodiode cell before and after laser cleaning procedures. A comparison with the results obtained with a twin sample prepared by pulsed laser deposition is presented and discussed.

  9. On the structural and optical properties of sputtered hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    Barhdadi, A.; Chafik El ldrissi, M.

    2002-08-01

    The present work is essentially focused on the study of optical and structural properties of hydrogenated amorphous silicon thin films (a-Si:H) prepared by radio-frequency cathodic sputtering. We examine separately the influence of hydrogen partial pressure during film deposition, and the effect of post-deposition thermal annealings on the main optical characteristics of the layers such as refraction index, optical gap and Urbach energy. Using the grazing X-rays reflectometry technique, thin film structural properties are examined immediately after films deposition as well as after surface oxidation or annealing. We show that low hydrogen pressures allow a saturation of dangling bonds in the layers, while high doses lead to the creation of new defects. We show also that thermal annealing under moderate temperatures improves the structural quality of the deposited layers. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears for a long time stay in the ambient. (author)

  10. Characteristics of growth of complex ferroelectric oxide films by plasma-ion sputtering

    Science.gov (United States)

    Mukhortov, V. M.; Golovko, Yu. I.; Mukhortov, Vl. M.; Dudkevich, V. P.

    1981-02-01

    An experimental investigation was made of the process of growth of a complex oxide film, such as BaTiO3 or (Ba, Sr)TiO3, by plasma-ion sputtering. It was found that ion bombardment of a ceramic target knocked out neutral excited atoms. These atoms lost energy away from the target by collisions and at a certain critical distance hcr they were capable of oxidation to produce BaO, TiO, TiO2, and SrO. Therefore, depending on the distance between the cathode and the substrate, the “construction” material arrived in the form of atoms or molecules of simple oxides. These two (atomic and molecular) deposition mechanisms corresponded to two mechanisms of synthesis and crystallization differing in respect of the dependences of the growth rate, unit cell parameters, and other structural properties on the deposition temperature. The role of re-evaporation and of oxidation-reduction processes was analyzed.

  11. Estimation of Sputtering Damages on a Magnetron H- Ion Source Induced by Cs+ and H+ Ions

    CERN Document Server

    Pereira, H; Alessi, J; Kalvas, t

    2013-01-01

    An H− ion source is being developed for CERN’s Linac4 accelerator. A beam current requirement of 80 mA and a reliability above 99% during 1 year with 3 month uninterrupted operation periods are mandatory. To design a low-maintenance long life-time source, it is important to investigate and understand the wear mechanisms. A cesiated plasma discharge ion source, such as the BNL magnetron source, is a good candidate for the Linac4 ion source. However, in the magnetron source operated at BNL, the removal of material from the molybdenum cathode and the stainless steel anode cover plate surfaces is visible after extended operation periods. The observed sputtering traces are shown to result from cesium vapors and hydrogen gas ionized in the extraction region and subsequently accelerated by the extraction field. This paper presents a quantitative estimate of the ionization of cesium and hydrogen by the electron and H− beams in the extraction region of BNL’s magnetron ion source. The respective contributions o...

  12. Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni

    Science.gov (United States)

    Loch, D. A. L.; Aranda Gonzalvo, Y.; Ehiasarian, A. P.

    2017-06-01

    Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The ion energy distribution functions (IEDFs) were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5%. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time-dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse.

  13. Low friction coefficient coatings Ni-Cr by magnetron sputtering, DC

    Energy Technology Data Exchange (ETDEWEB)

    Morales-Hernandez, J.; Mandujano-Ruiz, A.; Torres-Gonzalez, J.; Espinosa-Beltran, F. J.; Herrera-Hernandez, H.

    2015-07-01

    Magnetron Sputter Deposition technique with DC was used for the deposition of Ni-Cr coatings on AISI 316 SS like substrate. The cathode with a nominal composition Ni-22 at% Cr was prepared by Mechanical Alloying (MA) technique, with a maximum milling time of 16 hours and, with a high energy SPEX 8000 mill. The coatings were made under Argon atmosphere at room temperature with a power of 100 W at different times of growth. Chemical composition, microstructure, topography, nano hardness and wear of the coatings were evaluated using the techniques of microanalysis by energy dispersive X-ray analyzer (EDAX), X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Nano-indentation and pin-on-Disk, respectively. After milling, was not detected contamination in the mixtures. XRD analysis revealed that the microstructure of the Ni-Cr alloy was maintained in the coatings with respect to MA powders, with some degree of recrystallization. Nano hardness values were in the order of 8.8 GPa with a Youngs modulus of 195 GPa. The adhesion of the films was evaluated according to their resistance to fracture when these were indented at different loads using Vickers microhardness. The wear test results showed a decrease in the friction coefficient with respect to the increase of thickness films, getting a minimum value of 0.08 with a thickness of 1 μm and which correspond with the maximum growing time. (Author)

  14. Improved Rare-Earth Emitter Hollow Cathode

    Science.gov (United States)

    Goebel, Dan M.

    2011-01-01

    An improvement has been made to the design of the hollow cathode geometry that was created for the rare-earth electron emitter described in Compact Rare Earth Emitter Hollow Cathode (NPO-44923), NASA Tech Briefs, Vol. 34, No. 3 (March 2010), p. 52. The original interior assembly was made entirely of graphite in order to be compatible with the LaB6 material, which cannot be touched by metals during operation due to boron diffusion causing embrittlement issues in high-temperature refractory materials. Also, the graphite tube was difficult to machine and was subject to vibration-induced fracturing. This innovation replaces the graphite tube with one made out of refractory metal that is relatively easy to manufacture. The cathode support tube is made of molybdenum or molybdenum-rhenium. This material is easily gun-bored to near the tolerances required, and finish machined with steps at each end that capture the orifice plate and the mounting flange. This provides the manufacturability and robustness needed for flight applications, and eliminates the need for expensive e-beam welding used in prior cathodes. The LaB6 insert is protected from direct contact with the refractory metal tube by thin, graphite sleeves in a cup-arrangement around the ends of the insert. The sleeves, insert, and orifice plate are held in place by a ceramic spacer and tungsten spring inserted inside the tube. To heat the cathode, an insulating tube is slipped around the refractory metal hollow tube, which can be made of high-temperature materials like boron nitride or aluminum nitride. A screw-shaped slot, or series of slots, is machined in the outside of the ceramic tube to constrain a refractory metal wire wound inside the slot that is used as the heater. The screw slot can hold a single heater wire that is then connected to the front of the cathode tube by tack-welding to complete the electrical circuit, or it can be a double slot that takes a bifilar wound heater with both leads coming out

  15. Ion beam sputter coatings for laser technology

    Science.gov (United States)

    Ristau, Detlev; Gross, Tobias

    2005-09-01

    The initial motivation for the development of Ion Beam Sputtering (IBS) processes was the need for optical coatings with extremely low optical scatter losses for laser gyros. Especially, backscattering of the gyro-mirrors couples the directional modes in the ring resonator leading to the lock in effect which limits the sensitivity of the gyro. Accordingly, the first patent on IBS was approved for an aircraft company (Litton) in 1978. In the course of the rapid development of the IBS-concept during the last two decades, an extremely high optical quality could be achieved for laser coatings in the VIS- and NIR-spectral region. For example, high reflecting coatings with total optical losses below 1 ppm were demonstrated for specific precision measurement applications with the Nd:YAG-laser operating at 1.064 μm. Even though the high quality level of IBS-coatings had been confirmed in many applications, the process has not found its way into the production environment of most optical companies. Major restrictions are the relatively low rate of the deposition process and the poor lateral homogeneity of the coatings, which are related to the output characteristics of the currently available ion sources. In the present contribution, the basic principles of IBS will be discussed in the context of the demands of modern laser technology. Besides selected examples for special applications of IBS, aspects will be presented for approaches towards rapid manufacturing of coatings and the production of rugate filters on the basis of IBS-techniques.

  16. Progress of air-breathing cathode in microbial fuel cells

    Science.gov (United States)

    Wang, Zejie; Mahadevan, Gurumurthy Dummi; Wu, Yicheng; Zhao, Feng

    2017-07-01

    Microbial fuel cell (MFC) is an emerging technology to produce green energy and vanquish the effects of environmental contaminants. Cathodic reactions are vital for high electrical power density generated from MFCs. Recently tremendous attentions were paid towards developing high performance air-breathing cathodes. A typical air-breathing cathode comprises of electrode substrate, catalyst layer, and air-diffusion layer. Prior researches demonstrated that each component influenced the performance of air-breathing cathode MFCs. This review summarized the progress in development of the individual component and elaborated main factors to the performance of air-breathing cathode.

  17. Cathode Composition in a Saltwater Metal-Air Battery

    Directory of Open Access Journals (Sweden)

    William Shen

    2017-01-01

    Full Text Available Metal-air batteries consist of a solid metal anode and an oxygen cathode of ambient air, typically separated by an aqueous electrolyte. Here, simple saltwater-based models of aluminum-air and zinc-air cells are used to determine the differences between theoretical cell electric potentials and experimental electric potentials. A substantial difference is observed. It is also found that the metal cathode material is crucial to cell electric potential, despite the cathode not participating in the net reaction. Finally, the material composition of the cathode appears to have a more significant impact on cell potential than the submerged surface area of the cathode.

  18. Emission ability of La-Sc-Mo cathode

    International Nuclear Information System (INIS)

    Yang Jiancan; Nie Zuoren; Xi Xiaoli; Wang Yiman

    2004-01-01

    In this paper La-Sc-Mo cathode has been prepared and its electron emission ability was measured. This type of cathode shows good electron emission performance that the saturated current density is 6.74 A cm -1 and the work function is about 2.59 eV at 1300 deg. C, which is much lower than thoriated tungsten cathode (Th-W). So it is a potential cathode to replace the Th-W cathode with radioactive pollution. Surface analysis shows that good emission ability due to the 20 nm surplus La layer and the element Sc may do good to the La diffusion to the surface

  19. Explosive emission cathode on the base of carbon plastic fibre

    International Nuclear Information System (INIS)

    Korenev, S.A.; Baranov, A.M.; Kostyuchenko, S.V.; Chernenko, N.M.

    1989-01-01

    A fabrication process for explosive emission cathodes on the base of carbon plastic fibre of practically any geometrical shape and dimensions is developed. Experimental studies of electron beam current collection from cathodes, 2cm in diameter, at voltages across the diode of 10 and 150-250kV. It is shown that the ignition voltage for cathode plasma is ∼2kV at the interelectrode diode gap of 5mm and residual gas pressure of ∼5x10 -5 Torr. The carbon-fibre cathode, fabricated in this way, provides more stable current collection of an electron beam (without oscillations) than other cathodes

  20. Co-deposition of metallic actinides on a solid cathode

    Energy Technology Data Exchange (ETDEWEB)

    Limmer, S. J.; Williamson, M. A.; Willit, J. L. [Argonne National Laboratory, Argonne (United States)

    2008-08-15

    The amount of rare earth contamination that will be found in a co-deposit of actinides is a function of the type of cathode used. A non-alloying solid cathode will result in a significantly lower rare earth contamination in the actinide co-deposit than a liquid cadmium cathode. With proper control of the cathode potential vs. a stable reference electrode, co-deposition of uranium with other more electroactive metals has been demonstrated using a non-alloying solid cathode.

  1. Co-deposition of metallic actinides on a solid cathode

    International Nuclear Information System (INIS)

    Limmer, S. J.; Williamson, M. A.; Willit, J. L.

    2008-01-01

    The amount of rare earth contamination that will be found in a co-deposit of actinides is a function of the type of cathode used. A non-alloying solid cathode will result in a significantly lower rare earth contamination in the actinide co-deposit than a liquid cadmium cathode. With proper control of the cathode potential vs. a stable reference electrode, co-deposition of uranium with other more electroactive metals has been demonstrated using a non-alloying solid cathode

  2. Polymer coatings as separator layers for microbial fuel cell cathodes

    KAUST Repository

    Watson, Valerie J.

    2011-03-01

    Membrane separators reduce oxygen flux from the cathode into the anolyte in microbial fuel cells (MFCs), but water accumulation and pH gradients between the separator and cathode reduces performance. Air cathodes were spray-coated (water-facing side) with anion exchange, cation exchange, and neutral polymer coatings of different thicknesses to incorporate the separator into the cathode. The anion exchange polymer coating resulted in greater power density (1167 ± 135 mW m-2) than a cation exchange coating (439 ± 2 mW m-2). This power output was similar to that produced by a Nafion-coated cathode (1114 ± 174 mW m-2), and slightly lower than the uncoated cathode (1384 ± 82 mW m-2). Thicker coatings reduced oxygen diffusion into the electrolyte and increased coulombic efficiency (CE = 56-64%) relative to an uncoated cathode (29 ± 8%), but decreased power production (255-574 mW m-2). Electrochemical characterization of the cathodes ex situ to the MFC showed that the cathodes with the lowest charge transfer resistance and the highest oxygen reduction activity produced the most power in MFC tests. The results on hydrophilic cathode separator layers revealed a trade off between power and CE. Cathodes coated with a thin coating of anion exchange polymer show promise for controlling oxygen transfer while minimally affecting power production. © 2010 Elsevier B.V. All rights reserved.

  3. Cathode R&D for Future Light Sources

    Energy Technology Data Exchange (ETDEWEB)

    Dowell, D.H.; /SLAC; Bazarov, I.; Dunham, B.; /Cornell U., CLASSE; Harkay, K.; /Argonne; Hernandez-Garcia; /Jefferson Lab; Legg, R.; /Wisconsin U., SRC; Padmore, H.; /LBL, Berkeley; Rao, T.; Smedley, J.; /Brookhaven; Wan, W.; /LBL, Berkeley

    2010-05-26

    This paper reviews the requirements and current status of cathodes for accelerator applications, and proposes a research and development plan for advancing cathode technology. Accelerator cathodes need to have long operational lifetimes and produce electron beams with a very low emittance. The two principal emission processes to be considered are thermionic and photoemission with the photocathodes being further subdivided into metal and semi-conductors. Field emission cathodes are not included in this analysis. The thermal emittance is derived and the formulas used to compare the various cathode materials. To date, there is no cathode which provides all the requirements needed for the proposed future light sources. Therefore a three part research plan is described to develop cathodes for these future light source applications.

  4. Cathode R and D for future light sources

    Energy Technology Data Exchange (ETDEWEB)

    Dowell, D.H., E-mail: dowell@slac.stanford.ed [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025 (United States); Bazarov, I.; Dunham, B. [Cornell University, Cornell Laboratory for Accelerator-Based Sciences and Education (CLASSE) Wilson Laboratory, Cornell University, Ithaca, NY 14853 (United States); Harkay, K. [Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, Il 60439 (United States); Hernandez-Garcia, C. [Thomas Jefferson Laboratory, 12000 Jefferson Ave, Free Electron Laser Suite 19 Newport News, VA 23606 (United States); Legg, R. [University of Wisconsin, SRC, 3731 Schneider Dr., Stoughton, WI 53589 (United States); Padmore, H. [Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720 (United States); Rao, T.; Smedley, J. [Brookhaven National Laboratory, 20 Technology Street, Bldg. 535B, Brookhaven National Laboratory Upton, NY 11973 (United States); Wan, W. [Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720 (United States)

    2010-10-21

    This paper reviews the requirements and current status of cathodes for accelerator applications, and proposes a research and development plan for advancing cathode technology. Accelerator cathodes need to have long operational lifetimes and produce electron beams with a very low emittance. The two principal emission processes to be considered are thermionic and photoemission with the photocathodes being further subdivided into metal and semi-conductors. Field emission cathodes are not included in this analysis. The thermal emittance is derived and the formulas used to compare the various cathode materials. To date, there is no cathode which provides all the requirements needed for the proposed future light sources. Therefore a three part research plan is described to develop cathodes for these future light source applications.

  5. Emission mechanism in high current hollow cathode arcs

    International Nuclear Information System (INIS)

    Krishnan, M.

    1976-01-01

    Large (2 cm-diameter) hollow cathodes have been operated in a magnetoplasmadynamic (MPD) arc over wide ranges of current (0.25 to 17 kA) and mass flow (10 -3 to 8 g/sec), with orifice current densities and mass fluxes encompassing those encountered in low current steady-state hollow cathode arcs. Detailed cathode interior measurements of current and potential distributions show that maximum current penetration into the cathode is about one diameter axially upstream from the tip, with peak inner surface current attachment up to one cathode diameter upstream of the tip. The spontaneous attachment of peak current upstream of the cathode tip is suggested as a criterion for characteristic hollow cathode operation. This empirical criterion is verified by experiment

  6. Simple model of surface roughness for binary collision sputtering simulations

    Science.gov (United States)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-02-01

    It has been shown that surface roughness can strongly influence the sputtering yield - especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the "density gradient model") which imitates surface roughness effects. In the model, the target's atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient - leading to increased sputtering yields, similar in effect to surface roughness.

  7. Energy sharing and sputtering in low-energy collision cascades

    International Nuclear Information System (INIS)

    Weller, R.A.; Weller, M.R.

    1982-01-01

    Using a non-linear transport equation to describe the energy-sharing process in an isotropic collision cascade, we have numerically calculated sputtered particle velocity spectra for several very low energy (=< 10 eV) primary recoil distributions. Our formulation of the sputtering process is essentially that used in the linear model and our equations yield the familiar linear model results in the appropriate limit. Discrepancies between our calculations and the linear model results in other cases may be understood by considering the effects of the linear model assumptions on the sputtering yield at very low energies. Our calculations are also compared with recent experimental results investigating ion-explosion sputtering. The results of this comparison support the conclusion that in insulators sputtering is initiated by very low energy recoil atoms when the energy of the incident beam is high enough that the stopping power is dominated by the electronic contribution. The calculations also suggest that energy spectra similar to those for evaporation may result from non-equilibrium processes but that the apparent temperatures of evaporation are not related in a simple way to any real temperature within the target. (author)

  8. The corrosion and passivity of sputtered Mg–Ti alloys

    International Nuclear Information System (INIS)

    Song, Guang-Ling; Unocic, Kinga A.; Meyer, Harry; Cakmak, Ercan; Brady, Michael P.; Gannon, Paul E.; Himmer, Phil; Andrews, Quinn

    2016-01-01

    Highlights: • A supersaturated single phase Mg–Ti alloy can be obtained by magnetron sputtering. • The anodic dissolution of Mg–Ti alloy is inhibited by Ti addition. • The alloy becomes passive when Ti content is high and the alloy has become Ti based. • The formation of a continuous thin passive film is responsible for the passivation of the alloy. - Abstract: This study explored the possibility of forming a “stainless” Mg–Ti alloy. The electrochemical behavior of magnetron-sputtered Mg–Ti alloys was measured in a NaCl solution, and the surface films on the alloys were examined by XPS, SEM and TEM. Increased corrosion resistance was observed with increased Ti content in the sputtered Mg–Ti alloys, but passive-like behavior was not reached until the Ti level (atomic %) was higher than the Mg level. The surface film that formed on sputtered Mg–Ti based alloys in NaCl solution was thick, discontinuous and non-protective, whereas a thin, continuous and protective Mg and Ti oxide film was formed on a sputtered Ti–Mg based alloy.

  9. Nitinol: Tubing versus sputtered film - microcleanliness and corrosion behavior.

    Science.gov (United States)

    Wohlschlögel, Markus; Lima de Miranda, Rodrigo; Schüßler, Andreas; Quandt, Eckhard

    2016-08-01

    Corrosion behavior and microcleanliness of medical-device grade Nitinol tubing (Nix Ti1- x , x = 0.51; outer diameter 7 mm, wall thickness 0.5 mm), drawn from various ingot qualities, are compared to the characteristics of sputtered Nitinol film material (Nix Ti1- x , x = 0.51; thickness 50 µm). Electropolished tubing half-shell samples are tested versus as-received sputtered film samples. Inclusion size distributions are assessed using quantitative metallography and corrosion behavior is investigated by potentiodynamic polarization testing in phosphate-buffered saline at body temperature. For the sputtered film samples, the surface chemistry is additionally analyzed employing Auger Electron Spectroscopy (AES) composition-depth profiling. Results show that the fraction of breakdowns in the potentiodynamic polarization test correlates with number and size of the inclusions in the material. For the sputtered Nitinol film material no inclusions were detectable by light microscopy on the one hand and no breakdowns were found in the potentiodynamic polarization test on the other hand. As for electropolished Nitinol, the sputtered Nitinol film material reveals Nickel depletion and an Oxygen-to-Titanium intensity ratio of ∼2:1 in the surface oxide layer, as measured by AES. © 2015 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 104B: 1176-1181, 2016. © 2015 Wiley Periodicals, Inc.

  10. The effect of cathode geometry on barium transport in hollow cathode plasmas

    International Nuclear Information System (INIS)

    Polk, James E.; Mikellides, Ioannis G.; Katz, Ira; Capece, Angela M.

    2014-01-01

    The effect of barium transport on the operation of dispenser hollow cathodes was investigated in numerical modeling of a cathode with two different orifice sizes. Despite large differences in cathode emitter temperature, emitted electron current density, internal xenon neutral and plasma densities, and size of the plasma-surface interaction region, the barium transport in the two geometries is qualitatively very similar. Barium is produced in the insert and flows to the surface through the porous structure. A buildup of neutral Ba pressure in the plasma over the emitter surface can suppress the reactions supplying the Ba, restricting the net production rate. Neutral Ba flows into the dense Xe plasma and has a high probability of being ionized at the periphery of this zone. The steady state neutral Ba density distribution is determined by a balance between pressure gradient forces and the drag force associated with collisions between neutral Ba and neutral Xe atoms. A small fraction of the neutral Ba is lost upstream. The majority of the neutral Ba is ionized in the high temperature Xe plasma and is pushed back to the emitter surface by the electric field. The steady state Ba + ion density distribution results from a balance between electrostatic and pressure forces, neutral Xe drag and Xe + ion drag with the dominant forces dependent on location in the discharge. These results indicate that hollow cathodes are very effective at recycling Ba within the discharge and therefore maintain a high coverage of Ba on the emitter surface, which reduces the work function and sustains high electron emission current densities at moderate temperatures. Barium recycling is more effective in the cathode with the smaller orifice because the Ba is ionized in the dense Xe plasma concentrated just upstream of the orifice and pushed back into the hollow cathode. Despite a lower emitter temperature, the large orifice cathode has a higher Ba loss rate through the orifice because the Xe

  11. New discharge tube with virtual cathode

    International Nuclear Information System (INIS)

    Seidelmann, L.; Aubrecht, L.

    2003-01-01

    Till this time known methods of the excitation of the discharge between electrodes are using either secondary or thermo emission of electrons by the cathode. Usually we speak about the self-maintained discharge. Lifetime of the cathode, that is shortened by the emission, limits in principle, the lifetime of the whole discharge tube. The discharge can, according to the present state of the art, be induced also by the inductive way. Arrangement for excitation of such discharge is rather expensive. The construction of the inductive excited discharge tube is considerably influenced by the necessity of the limitation of the losses in excitation magnetic circuits. Especially length of the discharge and pressure of the working gas are limited by the economic standpoints. Function of the discharge is always connected with unwanted electromagnetic radiation, whose restraint is expensive and represents limiting factor for arrangement of the discharge tube (Authors)

  12. Barium Depletion in Hollow Cathode Emitters

    Science.gov (United States)

    Polk, James E.; Capece, Angela M.; Mikellides, Ioannis G.; Katz, Ira

    2009-01-01

    The effect of tungsten erosion, transport and redeposition on the operation of dispenser hollow cathodes was investigated in detailed examinations of the discharge cathode inserts from an 8200 hour and a 30,352 hour ion engine wear test. Erosion and subsequent re-deposition of tungsten in the electron emission zone at the downstream end of the insert reduces the porosity of the tungsten matrix, preventing the ow of barium from the interior. This inhibits the interfacial reactions of the barium-calcium-aluminate impregnant with the tungsten in the pores. A numerical model of barium transport in the internal xenon discharge plasma shows that the barium required to reduce the work function in the emission zone can be supplied from upstream through the gas phase. Barium that flows out of the pores of the tungsten insert is rapidly ionized in the xenon discharge and pushed back to the emitter surface by the electric field and drag from the xenon ion flow. This barium ion flux is sufficient to maintain a barium surface coverage at the downstream end greater than 0.6, even if local barium production at that point is inhibited by tungsten deposits. The model also shows that the neutral barium pressure exceeds the equilibrium vapor pressure of the impregnant decomposition reaction over much of the insert length, so the reactions are suppressed. Only a small region upstream of the zone blocked by tungsten deposits is active and supplies the required barium. These results indicate that hollow cathode failure models based on barium depletion rates in vacuum dispenser cathodes are very conservative.

  13. Long pulse, plasma cathode E-gun

    International Nuclear Information System (INIS)

    Goebel, D.M.; Schumacher, R.W.; Watkins, R.M.

    1993-01-01

    A unique, long-pulse E-gun has been developed for high-power tube applications. The Hollow-Cathode-Plasma (HCP) E-gun overcomes the limitations of conventional thermionic-cathode guns that have limited current density (typically ≤ 10 A/cm 2 ) or field-emission guns that offer high current density but suffer from short pulsewidth capability (typically 50 A/cm 2 ), long-pulse operation without gap closure, and also requires no cathode-heater power. The gun employs a low-pressure glow discharge inside a hollow cathode (HC) structure to provide a stable, uniform plasma surface from which a high current-density electron beam can be extracted. The plasma density is controlled by a low-voltage HC discharge pulser to produce the desired electron current density at the first grid of a multi-grid accelerator system. A dc high-voltage electron-beam supply accelerates the electrons across the gap, while the HC pulser modulates the beam current to generate arbitrary pulse waveforms. The electron accelerator utilizes a multi-aperture array that produces a large area, high perveance (>35 μpervs) beam consisting initially of many individual beamlets. The E-beam is normally operated without an applied magnetic field in the ion-focused regime, where the plasma produced by beam ionization of a background gas space-charge neutralizes the beam, and the Bennett self-pinch compresses the beamlets and increases the current density. The self-pinched beam has been observed to propagate over a meter without beam breakup or instabilities. The HCP E-gun has been operated at voltages up to 150 kV, currents up to 750 A, and pulse lengths of up to 120 μsec

  14. Bi-metallic nanoparticles as cathode electrocatalysts

    Science.gov (United States)

    Lu, Jun; Amine, Khalil; Wang, Xiaoping; Luo, Xiangyi; Myers, Deborah J.

    2018-03-27

    A lithium-air battery cathode catalyst includes core-shell nanoparticles on a carbon support, wherein: a core of the core-shell nanoparticles is platinum metal; and a shell of the core-shell nanoparticles is copper metal; wherein: the core-shell nanoparticles have a weight ratio of the copper metal to the platinum metal from about 4% to about 6% copper to from about 2% to about 12% platinum, with a remaining percentage being the carbon support.

  15. Cathodic protection of a nuclear fuel facility

    International Nuclear Information System (INIS)

    Corbett, R.A.

    1989-01-01

    This article discusses corrosion on buried process piping and tanks at a nuclear fuel facility and the steps taken to design a system to control underground corrosion. Collected data have indicated that cathodic protection is needed to supplement the regular use of high-integrity, corrosion-resistant coatings; wrapping systems; special backfills; and insulation material. The technical approach discussed in this article is generally applicable to other types of power and/or industrial plants with extensive networks of underground steel piping

  16. Cathode readout with stripped resistive drift tubes

    International Nuclear Information System (INIS)

    Bychkov, V.N.; Kekelidze, G.D.; Novikov, E.A.; Peshekhonov, V.D.; Shafranov, M.D.; Zhiltsov, V.E.

    1995-01-01

    A straw tube drift chamber prototype has been constructed and tested. The straw tube material is mylar film covered with a carbon layer with a resistivity of 0.5, 30 and 70 kΩ/□. Both the anode wire and the cathode strip signals were detected to study the behaviour of the chamber in the presence of X-ray ionization. The construction and the results of the study are presented. (orig.)

  17. Cathode readout with stripped resistive drift tubes

    Science.gov (United States)

    Bychkov, V. N.; Kekelidze, G. D.; Novikov, E. A.; Peshekhonov, V. D.; Shafranov, M. D.; Zhiltsov, V. E.

    1995-12-01

    A straw tube drift chamber prototype has been constructed and tested. The straw tube material is mylar film covered with a carbon layer with a resistivity of 0.5, 30 and 70 kΩ/□. Both the anode wire and the cathode strip signals were detected to study the behaviour of the chamber in the presence of X-ray ionization. The construction and the results of the study are presented.

  18. Recent advancements in sputter-type heavy negative ion sources

    International Nuclear Information System (INIS)

    Alton, G.D.

    1989-01-01

    Significant advancement have been made in sputter-type negative ion sources which utilize direct surface ionization, or a plasma to form the positive ion beam used to effect sputtering of samples containing the material of interest. Typically, such sources can be used to generate usable beam intensities of a few μA to several mA from all chemically active elements, depending on the particular source and the electron affinity of the element in question. The presentation will include an introduction to the fundamental processes underlying negative ion formation by sputtering from a low work function surface and several sources will be described which reflect the progress made in this technology. 21 refs., 9 figs., 1 tab

  19. Angular distributions of sputtered particles from NiTi alloy

    International Nuclear Information System (INIS)

    Neshev, I.; Hamishkeev, V.; Chernysh, V.S.; Postnikov, S.; Mamaev, B.

    1993-01-01

    The angular distributions of sputtered Ni and Ti from a polycrystalline NiTi (50-50%) alloy are investigated by Auger electron spectroscopy and Rutherford backscattering spectroscopy. A difference in the angular distributions is observed with Ni being sputtered preferentially near the surface normal. A computer program for the calculation of the angular distributions of constituents sputtered from binary targets is created and used. The mechanisms responsible for the observed differences in the angular distributions are discussed. It is found that the collisional cascade theory is not directly applicable to the results of the constituents' angular distributions obtained in the presence of oxygen. The fitted coefficients of bombardment-induced segregation are found to be greater than the experimentally obtained ones. (author)

  20. Sputtering of amorphous carbon layers studied by laser induced fluorescence

    International Nuclear Information System (INIS)

    Pasch, E.

    1992-07-01

    In order to minimize the radiation losses, it is desirable to keep the plasmas in nuclear fusion devices free of high-Z-impurities. Therefore, the walls of TEXTOR and other tokamaks are covered with thin layers of amorphous carbon layers (a-C:H) or amorphous carbon/boron layers (a-C/B:H). The sputtering behaviour of these layers has been studied under bombardment by Ar + ions with energies of 1.5 keV and current densities of a few mA/cm 2 . Investigations of these coatings were carried out with the object to measure the velocity distribution of the sputtered atoms and the sputtered yields by laser induced fluorescence in the vacuum ultraviolet. (orig.)

  1. Combined sputtering yield and surface topography development studies on Si

    International Nuclear Information System (INIS)

    Carter, G.; Nobes, M.J.; Lewis, G.W.; Whitton, J.L.

    1981-01-01

    The sputtering yield-incidence angle function has been measured for 8 keV Ar + ions incident on Si by direct scanning electron microscope observation of the depths of sputtered craters on substrate boundaries. This function displays a maximum sputtering yield at an angle thetasub(p) approximately equal to 40 0 to the surface normal. The sequential ion fluence dependence of features developed beneath local surface contaminant was then studied, quasi dynamically, in the same on-line ion source-S.E.M. system. During erosion of the contaminant a steeply elevated pillar of Si forms, which then transforms to a cone, again of high elevation angle >>thetasub(p). This cone is gradually eroded into the surrounding surface with no special significance associated with orientations of angle thetasub(p). Pedal depressions surrounding the pillar-cone system are also noted. The reasons for these observations and their relevance to ion beam surface channel etching are discussed. (Auth.)

  2. Measurements of sputtering yields for low-energy plasma ions

    International Nuclear Information System (INIS)

    Nishi, M.; Yamada, M.; Suckewer, S.; Rosengaus, E.

    1979-04-01

    Sputtering yields of various wall/limiter materials of fusion devices have been extensively measured in the relevant plasma environment for low-energy light ions (E 14 cm -3 and electron temperature up to 10eV. Target materials used were C (graphite), Ti, Mo, Ta, W, and Fe (stainless steel). In order to study the dependence of the sputtering yields on the incident energy of ions, the target samples were held at negative bias voltage up to 300V. The sputtering yields were determined by a weight-loss method and by spectral line intensity measurements. The data obtained in the present experiment agree well with those previously obtained at the higher energies (E greater than or equal to 200eV) by other authors using different schemes; the present data also extend to substantially lower energies (E approx. > 30eV) than hitherto

  3. Carbon Back Sputter Modeling for Hall Thruster Testing

    Science.gov (United States)

    Gilland, James H.; Williams, George J.; Burt, Jonathan M.; Yim, John T.

    2016-01-01

    In support of wear testing for the Hall Effect Rocket with Magnetic Shielding (HERMeS) program, the back sputter from a Hall effect thruster plume has been modeled for the NASA Glenn Research Centers Vacuum Facility 5. The predicted wear at a near-worst case condition of 600 V, 12.5 kW was found to be on the order of 3 4 mkhour in a fully carbon-lined chamber. A more detailed numerical monte carlo code was also modified to estimate back sputter for a detailed facility and pumping configuration. This code demonstrated similar back sputter rate distributions, but is not yet accurately modeling the magnitudes. The modeling has been benchmarked to recent HERMeS wear testing, using multiple microbalance measurements. These recent measurements have yielded values, on the order of 1.5- 2 microns/khour.

  4. A definitive criterion for cathodic protection

    Energy Technology Data Exchange (ETDEWEB)

    Alexander, Roger [Cathodic Protection Network International Ltd., Reading (United Kingdom)

    2009-07-01

    The corrosion reaction is defined using the Pourbaix Diagram and includes consideration of the pH, temperature, pressure, nobility of the metal and conductivity of the electrolyte. The passive zone can be established in a laboratory by creating a closed circuit condition in which the voltages can be measured. Natural corrosion cells occurring in simple conditions can be evaluated for the purpose of monitoring the performance of cathodic protection. Metal pipelines are complex networks of conductors submerged in electrolyte of infinitely variable qualities. The present method used to ascertain the effectiveness of cathodic protection has many inherent errors and results in costly and unpredictable corrosion failures. An electrode has been devised to define the exact electrical status of the corrosion reaction at its location. The design allows a closed circuit measurement of the corrosion current that can determine whether or not corrosion has been stopped by cathodic protection. This has allowed the development of software that can calculate the condition and corrosion status throughout a network of pipelines, using electrical circuit analysis common in the electronics industry. (author)

  5. Depth of origin of atoms sputtered from crystalline targets

    International Nuclear Information System (INIS)

    Shapiro, M.H.; Trovato, E.; Tombrello, T.A.

    2001-01-01

    Recently, V.I. Shulga and W. Eckstein (Nucl. Instr. and Meth. B 145 (1998) 492) investigated the depth of origin of atoms sputtered from random elemental targets using the Monte Carlo code TRIM.SP and the lattice code OKSANA. They found that the mean depth of origin is proportional to N -0.86 , where N is the atomic density; and that the most probable escape depth is ∼λ 0 /2, where λ 0 is the mean atomic distance. Since earlier molecular dynamics simulations with small crystalline elemental targets typically produced a most probable escape depth of zero (i.e., most sputtered atoms came from the topmost layer of the target), we have carried out new molecular dynamics simulations of sputtered atom escape depths with much larger crystalline targets. Our new results, which include the bcc targets Cs, Rb and W, as well as the fcc targets Cu and Au predict that the majority of sputtered atoms come from the first atomic layer for the bcc(1 0 0), bcc(1 1 1), fcc(1 0 0) and fcc(1 1 1) targets studied. For the high-atomic density targets Cu, Au and W, the mean depth of origin of sputtered atoms typically is less than 0.25λ 0 . For the low-atomic density targets Cs and Rb, the mean depth of origin of sputtered atoms is considerably larger, and depends strongly on the crystal orientation. We show that the discrepancy between the single-crystal and amorphous target depth of origin values can be resolved by applying a simple correction to the single-crystal results

  6. Study of the chemical sputtering in Tore-Supra

    International Nuclear Information System (INIS)

    Cambe, A.

    2002-01-01

    The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C 2 D x and C 3 D y ) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD 4 (Y CD4 ) is highly flux (φ) dependent, showing a variation of the form: Y CD4 ∝ φ -0.23 . The experimental study also reveals that an increase of the surface temperature induces an augmentation of Y CD4 . The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, μm wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 μm of tungsten. (author)

  7. Arc generation from sputtering plasma-dielectric inclusion interactions

    International Nuclear Information System (INIS)

    Wickersham, C.E. Jr.; Poole, J.E.; Fan, J.S.

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al 2 O 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect density, and the intensity of the optical emission from the arcing plasma indicates that the critical aluminum oxide inclusion area for arcing is 0.22±0.1 mm2 when the sputtering plasma sheath dark-space λ d , is 0.51 mm. Inclusions with areas greater than this critical value readily induce arcing and macroparticle ejection during sputtering. Inclusions below this critical size do not cause arcing or macroparticle ejection. When the inclusion major axis is longer than 2λ d and lies perpendicular to the sputter erosion track tangent, the arcing activity increases significantly over the case where the inclusion major axis lies parallel to the erosion track tangent

  8. Structure and corrosion behavior of sputter deposited cerium oxide based coatings with various thickness on Al 2024-T3 alloy substrates

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Yuanyuan [College of Materials Science and Engineering, Chongqing University, Chongqing 400045 (China); Materials Research Center, Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, MO 65409 (United States); Huang, Jiamu, E-mail: huangjiamu@cqu.edu.cn [College of Materials Science and Engineering, Chongqing University, Chongqing 400045 (China); Claypool, James B.; Castano, Carlos E. [Materials Research Center, Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, MO 65409 (United States); O’Keefe, Matthew J., E-mail: mjokeefe@mst.edu [Materials Research Center, Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, MO 65409 (United States)

    2015-11-15

    Highlights: • Crystalline CeO{sub 2} coatings are deposited on Al 2024-T3 alloys by magnetron sputtering. • The crystal size and internal stress both increased with the thickness of CeO{sub 2} coating. • The ∼210 nm thick coating has the highest adhesion strength to the Al alloy substrate. • The ∼900 nm thick coating increased the corrosion resistance two orders of magnitude. • CeO{sub 2} coatings provide good cathodic inhibition for Al alloys by acting as physical barriers. - Abstract: Cerium oxide based coatings from ∼100 to ∼1400 nm in thickness were deposited onto Al 2024-T3 alloy substrates by magnetron sputtering of a 99.99% pure CeO{sub 2} target. The crystallite size of CeO{sub 2} coatings increased from 15 nm to 46 nm as the coating thickness increased from ∼100 nm to ∼1400 nm. The inhomogeneous lattice strain increased from 0.36% to 0.91% for the ∼100 nm to ∼900 nm thick coatings and slightly decreased to 0.89% for the ∼1400 nm thick coating. The highest adhesion strength to Al alloy substrates was for the ∼210 nm thick coating, due to a continuous film coverage and low internal stress. Electrochemical measurements indicated that sputter deposited crystalline CeO{sub 2} coatings acted as physical barriers that provide good cathodic inhibition for Al alloys in saline solution. The ∼900 nm thick CeO{sub 2} coated sample had the best corrosion performance that increased the corrosion resistance by two orders magnitude and lowered the cathodic current density 30 times compared to bare Al 2024-T3 substrates. The reduced defects and exposed surface, along with suppressed charge mobility, likely accounts for the improved corrosion performance as coating thickness increased from ∼100 nm to ∼900 nm. The corrosion performance decreased for ∼1400 nm thick coatings due in part to an increase in coating defects and porosity along with a decrease in adhesion strength.

  9. Rf reactive sputtering of indium-tin-oxide films

    International Nuclear Information System (INIS)

    Tvarozek, V.; Novotny, I.; Harman, R.; Kovac, J.

    1986-01-01

    Films of indium-tin-oxide (ITO) have been deposited by rf reactive diode sputtering of metallic InSn alloy targets, or ceramic ITO targets, in an Ar and Ar+0 2 atmosphere. Electrical as well as optical properties of ITO films were controlled by varying sputtering parameters and by post-deposition heat-treatment in Ar, H 2 , N 2 , H 2 +N 2 ambients. The ITO films exhibited low resistivity approx. 2 x 10 -4 Ω cm, high transmittance approx. 90% in the visible spectral region and high reflectance approx. 80% in the near infra-red region. (author)

  10. Mechanical and structural properties of sputtered Ni/Ti multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Senthil Kumar, M.; Boeni, P.; Tixier, S.; Clemens, D.; Horisberger, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1997-09-01

    Ni/Ti bilayers have been prepared by dc-magnetron sputtering in order to study their mechanical and structural properties. A remarkable reduction of stress is observed when the Ni layers are sputtered reactively in argon with a high partial pressure of air. The high angle x-ray diffraction studies show a tendency towards amorphisation of the Ni layers with increasing air flow. The low angle measurements indicate a substantial reduction of interdiffusion resulting in smoother interfaces with increasing air content. (author) 2 figs., 2 refs.

  11. High power impulse magnetron sputtering and its applications

    Science.gov (United States)

    Yan, YUAN; Lizhen, YANG; Zhongwei, LIU; Qiang, CHEN

    2018-04-01

    High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

  12. Nanoporous zinc oxide films prepared by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.

    2011-01-01

    In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.

  13. Heteroepitaxial Ge-on-Si by DC magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Martin Steglich

    2013-07-01

    Full Text Available The growth of Ge on Si(100 by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C. At lower temperatures (320°C, films are essentially amorphous with isolated nanocrystallites at the Si-Ge interface. A minor oxygen contamination at the interface, developing after ex-situ oxide removal, is not seen to hinder epitaxy. Compensation of dislocation-induced acceptors in Ge by sputtering from n-doped targets is proposed.

  14. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  15. Highly aligned carbon nanotube arrays fabricated by bias sputtering

    International Nuclear Information System (INIS)

    Hayashi, Nobuyuki; Honda, Shin-ichi; Tsuji, Keita; Lee, Kuei-Yi; Ikuno, Takashi; Fujimoto, Keiichi; Ohkura, Shigeharu; Katayama, Mitsuhiro; Oura, Kenjiro; Hirao, Takashi

    2003-01-01

    Vertically aligned carbon nanotube (CNT) arrays have been successfully grown on Si substrates by dc bias sputtering. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations revealed that the resultant arrays consisted of dense CNTs with diameters of 40-60 nm and lengths of 300-400 nm. The CNTs were found to have a bamboo-like structure at the end of which metallic nanoparticle was formed, indicating tip growth mechanism. The energy enhancement of carbon particles is a key factor for synthesis of CNTs using dc bias sputtering system

  16. Extended incident-angle dependence formula of sputter yield

    International Nuclear Information System (INIS)

    Ono, T.; Shibata, K.; Muramoto, T.; Kenmotsu, T.; Li Z.; Kawamura, T.

    2006-06-01

    We extend a new semi-empirical formula for incident-angle dependence of normalized sputter yield that includes the contribution to sputter yield from the direct knock-out process that was not considered in the previously proposed one. Three parameters included in the new one are estimated for data calculated with ACAT code for D + ions incident obliquely on C, Fe and W materials in incident-energy regions from several tens of eV to 10 keV. Then, the parameters are expressed with functions of incident energy. The formula with the functions derived well reproduces that using the ACAT data in the whole energy range. (author)

  17. Development of surface relief on polycrystalline metals due to sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Voitsenya, V.S. [IPP NSC KIPT, 61108 Kharkov (Ukraine); Balden, M. [Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching (Germany); Bardamid, A.F. [Taras Shevchenko National University, 01033 Kiev (Ukraine); Bondarenko, V.N. [IPP NSC KIPT, 61108 Kharkov (Ukraine); Davis, J.W., E-mail: jwdavis@starfire.utias.utoronto.ca [University of Toronto Institute for Aerospace Studies, 4925 Dufferin St., Toronto, ON, Canada M3H5T6 (Canada); Konovalov, V.G.; Ryzhkov, I.V.; Skoryk, O.O.; Solodovchenko, S.I. [IPP NSC KIPT, 61108 Kharkov (Ukraine); Zhang-jian, Zhou [University of Science and Technology Beijing, Beijing 100 083 (China)

    2013-05-01

    The characteristics of surface microrelief that appear in sputtering experiments with polycrystalline metals of various grain sizes have been studied. Specimens with grain sizes varying from 30–70 nm in the case of crystallized amorphous alloys, to 1–3 μm for technical tungsten grade and 10–100 μm for recrystallized tungsten were investigated. A model is proposed for the development of roughness on polycrystalline metals which is based on the dependence of sputtering rate on crystal orientation. The results of the modeling are in good agreement with experiments showing that the length scale of roughness is much larger than the grain size.

  18. X-ray photoelectron spectroscopy of nano-multilayered Zr-O/Al-O coatings deposited by cathodic vacuum arc plasma

    International Nuclear Information System (INIS)

    Zhitomirsky, V.N.; Kim, S.K.; Burstein, L.; Boxman, R.L.

    2010-01-01

    Nano-multilayered Zr-O/Al-O coatings with alternating Zr-O and Al-O layers having a bi-layer period of 6-7 nm and total coating thickness of 1.0-1.2 μm were deposited using a cathodic vacuum arc plasma process on rotating Si substrates. Plasmas generated from two cathodes, Zr and Al, were deposited simultaneously in a mixture of Ar and O 2 background gases. The Zr-O/Al-O coatings, as well as bulk ZrO 2 and Al 2 O 3 reference samples, were studied using X-ray photoelectron spectroscopy (XPS). The XPS spectra were analyzed on the surface and after sputtering with a 4 kV Ar + ion gun. High resolution angle resolved spectra were obtained at three take-off angles: 15 o , 45 o and 75 o relative to the sample surface. It was shown that preferential sputtering of oxygen took place during XPS of bulk reference ZrO 2 samples, producing ZrO and free Zr along with ZrO 2 in the XPS spectra. In contrast, no preferential sputtering was observed with Al 2 O 3 reference samples. The Zr-O/Al-O coatings contained a large amount of free metals along with their oxides. Free Zr and Al were observed in the coating spectra both before and after sputtering, and thus cannot be due solely to preferential sputtering. Transmission electron microscopy revealed that the Zr-O/Al-O coatings had a nano-multilayered structure with well distinguished alternating layers. However, both of the alternating layers of the coating contained of a mixture of aluminum and zirconium oxides and free Al and Zr metals. The concentration of Zr and Al changed periodically with distance normal to the coating surface: the Zr maximum coincided with the Al minimum and vice versa. However the concentration of Zr in both alternating layers was significantly larger than that of Al. Despite the large free metal concentration, the Knoop hardness, 21.5 GPa, was relatively high, which might be attributed to super-lattice formation or formation of a metal-oxide nanocomposite within the layers.

  19. Magnetron-sputtered La{sub 0.6}Sr{sub 0.4}Co{sub 0.2}Fe{sub 0.8}O{sub 3} nanocomposite interlayer for solid oxide fuel cells

    Energy Technology Data Exchange (ETDEWEB)

    Solovyev, A. A., E-mail: andrewsol@mail.ru; Ionov, I. V.; Shipilova, A. V.; Kovalchuk, A. N.; Syrtanov, M. S. [Tomsk Polytechnic University (Russian Federation)

    2017-03-15

    A thin layer of a La{sub 0.6}Sr{sub 0.4}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (LSCF) is deposited between the electrolyte and the La{sub 0.6}Sr{sub 0.4}Co{sub 0.2}Fe{sub 0.8}O{sub 3}/Ce{sub 0.9}Gd{sub 0.1}O{sub 2} (LSCF/CGO) cathode layer of a solid oxide fuel cell (SOFC) by pulsed magnetron sputtering using an oxide target of LSCF. The films were completely dense and well adherent to the substrate. The effects of annealing in temperature range from 200 to 1000 °C on the crystalline structure of the LSCF films have been studied. The films of nominal thickness, 250–500 nm, are crystalline when annealed at temperatures above 600 °C. The crystalline structure, surface topology, and morphology of the films were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), and scanning electron microscopy (SEM), respectively. To study the electrochemical characteristics of the deposited-film, solid oxide fuel cells using 325-nm LSCF films as interlayer between the electrolyte and the cathode have been fabricated. The LSCF interlayer improves the overall performance of the SOFC by increasing the interfacial area between the electrolyte and cathode. The electrolyte-supported cells with the interlayer have 30% greater, overall power output compared to that achieved with the cells without interlayer. The LSCF interlayer could also act as a transition layer that improves adhesion and relieves both thermal stress and lattice strain between the cathode and the electrolyte. Our results demonstrate that pulsed magnetron sputtering provides a low-temperature synthesis route for realizing ultrathin nanocrystalline LSCF film layers for intermediate- or low-temperature solid oxide fuel cells.

  20. Surface studies of thermionic cathodes and the mechanism of operation of an impregnated tungsten cathode

    International Nuclear Information System (INIS)

    Forman, R.

    1976-09-01

    The surface properties of conventional impregnated cathodes were investigated by the use of Auger spectroscopy and work function measurements, and these were compared with a synthesized barium- or barium oxide coated tungsten surface. The barium- and barium oxide coated surfaces were prepared by evaporating barium onto a tungsten surface that can be heated to elevated temperatures. Multilayer or monolayer coverages can be investigated using this technique. The results of this study show that the surface of an impregnated tungsten cathode is identical to that observed for a synthesized monolayer or partial monolayer of barium on partially oxidized tungsten, using the criteria of identical Auger patterns and work functions. Desorption measurements of barium from a tungsten surface were also made. These results in conjunction with Auger and work function data were interpreted to show that throughout most of its life an impregnated cathode operating in the range of 1100 C has a partial monolayer rather than a monolayer of barium on its surface

  1. Influence of R.F. sputter parameters on the magnetic orientation of Co-Cr layers

    NARCIS (Netherlands)

    Lodder, J.C.; Wielinga, T.

    1984-01-01

    Co-Cr layers for the perpendicular recording mode were deposited by means of RF-sputtering. The most important sputter parameters, i.e. the RF sputter high voltage VRF, the argon pressure Par and the substrate holder temperature Tsh, gave an optimum value for perpendicular orientation of the

  2. Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

    OpenAIRE

    Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

    2015-01-01

    We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx

  3. Cathode power distribution system and method of using the same for power distribution

    Science.gov (United States)

    Williamson, Mark A; Wiedmeyer, Stanley G; Koehl, Eugene R; Bailey, James L; Willit, James L; Barnes, Laurel A; Blaskovitz, Robert J

    2014-11-11

    Embodiments include a cathode power distribution system and/or method of using the same for power distribution. The cathode power distribution system includes a plurality of cathode assemblies. Each cathode assembly of the plurality of cathode assemblies includes a plurality of cathode rods. The system also includes a plurality of bus bars configured to distribute current to each of the plurality of cathode assemblies. The plurality of bus bars include a first bus bar configured to distribute the current to first ends of the plurality of cathode assemblies and a second bus bar configured to distribute the current to second ends of the plurality of cathode assemblies.

  4. Rf Gun with High-Current Density Field Emission Cathode

    International Nuclear Information System (INIS)

    Jay L. Hirshfield

    2005-01-01

    High current-density field emission from an array of carbon nanotubes, with field-emission-transistor control, and with secondary electron channel multiplication in a ceramic facing structure, have been combined in a cold cathode for rf guns and diode guns. Electrodynamic and space-charge flow simulations were conducted to specify the cathode configuration and range of emission current density from the field emission cold cathode. Design of this cathode has been made for installation and testing in an existing S-band 2-1/2 cell rf gun. With emission control and modulation, and with current density in the range of 0.1-1 kA/cm2, this cathode could provide performance and long-life not enjoyed by other currently-available cathodes

  5. Degradation factors of a new long life cathode

    International Nuclear Information System (INIS)

    Zhang Mingchen; Zhang Honglai; Liu Pukun; Li Yutao

    2011-01-01

    This paper analyses the degradation factors of a new long life coated impregnated cathode after accelerated life test. The surface state of the cathode is investigated with scanning electron microscope (SEM) as well as the content and variation of the various elements on the surface and the longitudinal section of the cathode are analyzed with Auger electron spectroscopy (AES) before and after the life test. The analyzing results with SEM show that the cathode coating shrinks at the life end and leads to a rise in its work function. The analyzing results with AES show that the percent of the W increases and the active materials Ba decreases on the cathode surface at the life end. Furthermore, there is less Ba underneath the cathode surface but still a lot of Ba in the tungsten matrix at the life end.

  6. Cathode plasma expansion in diode with explosive emission

    International Nuclear Information System (INIS)

    Zuo Yinghong; Fan Ruyu; Wang Jianguo; Zhu Jinhui

    2012-01-01

    The evolution characteristics of the cathode plasma in a planar diode with explosive emission were analyzed. Be- sides the axial expansion which can reduce the effective anode-cathode gap, the radial expansion of the cathode plasma which can affect the effective emitting area was also taken into account. According to the Child-Langmuir law and the experimental data of current and voltage with a electron vacuum diode under four-pulse mode, the dynamics of the cathode plasma was investigated, on the assumption that the radial speeds of the cathode plasma was approximately equal to the axial speed. The results show that the radial and axial expansion speeds of the cathode plasma are 0.9-2.8 cm/μs. (authors)

  7. Cathodic corrosion: Part 2. Properties of nanoparticles synthesized by cathodic corrosion

    International Nuclear Information System (INIS)

    Yanson, A.I.; Yanson, Yu.I.

    2013-01-01

    We demonstrate how cathodic corrosion in concentrated aqueous solutions enables one to prepare nanoparticles of various metals and metal alloys. Using various characterization methods we show that the composition of nanoparticles remains that of the starting material, and the resulting size distribution remains rather narrow. For the case of platinum we show how the size and possibly even the shape of the nanoparticles can be easily controlled by the parameters of corrosion. Finally, we discuss the advantages of using the nanoparticles prepared by cathodic corrosion for applications in (electro-)catalysis.

  8. Theory of hollow cathode arc discharges. II. Metastable state balance inside the cathode. Application to argon

    International Nuclear Information System (INIS)

    Ferreira, C.M.; Delcroix, J.L.

    1975-01-01

    In the hollow cathode the metastable species are created by fast electrons, which are emitted by the cathode wall and injected in the plasma across a space-charge sheath, and destroyed by Maxwellian electrons. A detailed analysis of the different electronic destruction mechanisms in argon shows that the re-excitation up to 3p 5 4p states plays a very important role. Solutions of the metastable balance equation were obtained in a wide range of variation of the discharge parameters displaying the best conditions of operation to obtain high concentrations [fr

  9. In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool

    International Nuclear Information System (INIS)

    Meng Liang; Raju, Ramasamy; Flauta, Randolph; Shin, Hyungjoo; Ruzic, David N.; Hayden, Douglas B.

    2010-01-01

    Using a newly designed and built plasma diagnostic system, the plasma parameters were investigated on a commercial 200 mm high-power hollow cathode magnetron (HCM) physical vapor deposition tool using Ta target under argon plasma. A three dimensional (3D) scanning radio frequency (rf)-compensated Langmuir probe was constructed to measure the spatial distribution of the electron temperature (T e ) and electron density (n e ) in the substrate region of the HCM tool at various input powers (2-15 kW) and pressures (10-70 mTorr). The T e was in the range of 1-3 eV, scaling with decreasing power and decreasing pressure. Meanwhile, n e was in the range of 4x10 10 -1x10 12 cm -3 scaling with increasing power and decreasing pressure. As metal deposits on the probe during the probe measurements, a self-cleaning plasma cup was designed and installed in the chamber to clean the tungsten probe tip. However, its effectiveness in recovering the measured plasma parameters was hindered by the metal layer deposited on the insulating probe tube which was accounted for the variation in the plasma measurements. Using a quartz crystal microbalance combined with electrostatic filters, the ionization fraction of the metal flux was measured at various input power of 2-16 kW and pressure of 5-40 mTorr. The metal ionization fraction reduced significantly with the increasing input power and decreasing gas pressure which were attributed to the corresponding variation in the ionization cross section and the residence time of the sputtered atoms in the plasma, respectively. Both the metal neutral and ion flux increased at higher power and lower pressure. The 3D measurements further showed that the ionization fraction decreased when moving up from the substrate to the cathode.

  10. Molten carbonate fuel cell cathode with mixed oxide coating

    Science.gov (United States)

    Hilmi, Abdelkader; Yuh, Chao-Yi

    2013-05-07

    A molten carbonate fuel cell cathode having a cathode body and a coating of a mixed oxygen ion conductor materials. The mixed oxygen ion conductor materials are formed from ceria or doped ceria, such as gadolinium doped ceria or yttrium doped ceria. The coating is deposited on the cathode body using a sol-gel process, which utilizes as precursors organometallic compounds, organic and inorganic salts, hydroxides or alkoxides and which uses as the solvent water, organic solvent or a mixture of same.

  11. Ultra High Energy Density Cathodes with Carbon Nanotubes

    Science.gov (United States)

    2013-12-10

    a) Carbon nanotube paper coated with NCA cathode composite for testing as positive electrode in Li-ion battery (b) Comparison of NCA specific...received and purified CNT electrodes coated with NCA cathode composite. (b) Discharge capacities as a function of rate and cycle for NCA on Al and...thickness increases. The first approach was to cast SOA NCA cathode composites onto CNT current collectors using an adjustable blade coater. The

  12. Knife-edge thin film field emission cathodes

    International Nuclear Information System (INIS)

    Lee, B.; Demroff, H.P.; Drew, M.M.; Elliott, T.S.; Mazumdar, T.K.; McIntyre, P.M.; Pang, Y.; Smith, D.D.; Trost, H.J.

    1993-01-01

    Cathodes made of thin-film field emission arrays (FEA) have the advantages of high current density, pulsed emission, and low bias voltage operation. The authors have developed a technology to fabricate knife-edge field emission cathodes on (110) silicon wafers. The emitter geometry is optimized for efficient modulation at high frequency. Cathode fabrication progress and preliminary analysis of their applications in RF power sources are presented

  13. Structured electron beams from nano-engineered cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Lueangaramwong, A. [NICADD, DeKalb; Mihalcea, D. [NICADD, DeKalb; Andonian, G. [RadiaBeam Tech.; Piot, P. [Fermilab

    2017-03-07

    The ability to engineer cathodes at the nano-scale have open new possibilities such as enhancing quantum eciency via surface-plasmon excitation, forming ultra-low-emittance beams, or producing structured electron beams. In this paper we present numerical investigations of the beam dynamics associated to this class of cathode in the weak- and strong-field regimes.We finally discuss the possible applications of some of the achievable cathode patterns when coupled with other phase space manipulations.

  14. Geiger counters of gamma rays with a bismuth cathode

    International Nuclear Information System (INIS)

    Meunier, R.; Legrand, J.P.

    1953-01-01

    Geiger Muller counters present a lake of efficiency of some per cent, for the γ radiations. In the region 0,3 - 1 MeV, a substantial growth of their output can be obtained by a special construction of their cathode. In accordance with previous works, we constructed some counter of formed cathode by a pleated copper wire fencing covered of Bi by electrolysis. The successive modifications brought to a cylindrical conventional cathode in sheet metal of copper, that succeeds to this type of cathode, drive to an improvement of the output. (M.B.) [fr

  15. Surface Characterization of the LCLS RF Gun Cathode

    International Nuclear Information System (INIS)

    Brachmann, Axel; Decker, Franz-Josef; Ding, Yuantao; Dowell, David; Emma, Paul; Frisch, Josef; Gilevich, Sasha; Hays, Gregory; Hering, Philippe; Huang, Zhirong; Iverson, Richard; Loos, Henrik; Miahnahri, Alan; Nordlund, Dennis; Nuhn, Heinz-Dieter; Pianetta, Piero; Turner, James; Welch, James; White, William; Wu, Juhao; Xiang, Dao

    2012-01-01

    The first copper cathode installed in the LCLS RF gun was used during LCLS commissioning for more than a year. However, after high charge operation (> 500 pC), the cathode showed a decline of quantum efficiency within the area of drive laser illumination. They report results of SEM, XPS and XAS studies that were carried out on this cathode after it was removed from the gun. X-ray absorption and X-ray photoelectron spectroscopy reveal surface contamination by various hydrocarbon compounds. In addition they report on the performance of the second installed cathode with emphasis on the spatial distribution of electron emission.

  16. Large area dispenser cathode applied to high current linac

    International Nuclear Information System (INIS)

    Yang Anmin; China Academy of Engineering Physics, Mianyang; Wu Dengxue; Liu Chenjun; Xia Liansheng; Wang Wendou; Zhang Kaizhi

    2005-01-01

    The paper introduced a dispenser cathode (411 M) which was 55 mm in diameter. A 200 kV long pulsed power generator with 2 μs flattop based on Marx-PEN and system with heat and voltage insulation were built. A 52 A space charge limited current was gained, when the temperature was 1165 degree C and the filament current was 18 A on the cathode and the voltage of the pulse was 75 kV at the cathode test stand. Experimental results show that the current values are consistent with the numerical simulation. The experiment reveals that the deflated gas will influence the cathode emission ability. (authors)

  17. Cathode fall measurement in a dielectric barrier discharge in helium

    Energy Technology Data Exchange (ETDEWEB)

    Hao, Yanpeng; Zheng, Bin; Liu, Yaoge [School of Electric Power, South China University of Technology, Guangzhou 510640 (China)

    2013-11-15

    A method based on the “zero-length voltage” extrapolation is proposed to measure cathode fall in a dielectric barrier discharge. Starting, stable, and discharge-maintaining voltages were measured to obtain the extrapolation zero-length voltage. Under our experimental conditions, the “zero-length voltage” gave a cathode fall of about 185 V. Based on the known thickness of the cathode fall region, the spatial distribution of the electric field strength in dielectric barrier discharge in atmospheric helium is determined. The strong cathode fall with a maximum field value of approximately 9.25 kV/cm was typical for the glow mode of the discharge.

  18. Measuring current emission and work functions of large thermionic cathodes

    International Nuclear Information System (INIS)

    Fortgang, C.M.

    2001-01-01

    As one component of the nations Stockpile Stewardship program, Los Alamos National Laboratory is constructing a 20 MeV, 2 kA (with a 4 kA upgrade capability), 3ps induction linac for doing x-ray radiography of explosive devices. The linac is one leg of a facility called the Dual-Axis Radiography Hydrodynamic Test Facility (DARHT). The electron gun is designed to operate at 3.2 MV. The gun is a Pierce type design and uses a 6.5' cathode for 2 kA operation and an 8' cathode for 4 kA operation. We have constructed a small facility called the Cathode Test Stand (CTS) to investigate engineering and physics issues regarding large thermionic dispenser-cathodes. In particular, we have looked at the issues of temperature uniformity on the cathode surface and cathode quality as measured by its work function. We have done thermal imaging of both 8' and 6.5' cathodes. Here we report on measurements of the cathode work function, both the average value and how it vanes across the face of the cathode.

  19. Explosive-emission cathode fabricated from superconducting cable

    International Nuclear Information System (INIS)

    Vavra, I.; Korenev, S.A.

    1989-01-01

    The authors describe on explosive-emission cathode that is based on stock superconducting cable - type NT-50, for example - that is bunched and held in a copper matrix. The copper matrix is partially etched away to create a multipoint structure for the cathode-plasma initiators. With 100-300 kV on the diode and a distance of 1 cm between the anode and cathode, electron currents of 20-80 and 60-300 A are obtained with cathode diameters of 0.5 and 1 cm, respectively

  20. Achieving high mobility ZnO : Al at very high growth rates by dc filtered cathodic arc deposition

    International Nuclear Information System (INIS)

    Mendelsberg, R J; Lim, S H N; Wallig, J; Anders, A; Zhu, Y K; Milliron, D J

    2011-01-01

    Achieving a high growth rate is paramount for making large-area transparent conducting oxide coatings at a low cost. Unfortunately, the quality of thin films grown by most techniques degrades as the growth rate increases. Filtered dc cathodic arc is a lesser known technique which produces a stream of highly ionized plasma, in stark contrast to the neutral atoms produced by standard sputter sources. Ions bring a large amount of potential energy to the growing surface which is in the form of heat, not momentum. By minimizing the distance from cathode to substrate, the high ion flux gives a very high effective growth temperature near the film surface without causing damage from bombardment. The high surface temperature is a direct consequence of the high growth rate and allows for high-quality crystal growth. Using this technique, 500-1300 nm thick and highly transparent ZnO : Al films were grown on glass at rates exceeding 250 nm min -1 while maintaining resistivity below 5 x 10 -4 Ω cm with electron mobility as high as 60 cm 2 V -1 s -1 . (fast track communication)

  1. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 e...

  2. Sputtering of solid deuterium by He-ions

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Pedrys, R.

    2001-01-01

    Sputtering of solid deuterium by bombardment of 3He+ and 4He+ ions was studied. Some features are similar to hydrogen ion bombardment of solid deuterium, but for the He-ions a significant contribution of elastic processes to the total yield can be identified. The thin-film enhancement is more pro...... pronounced than that for hydrogen projectiles in the same energy range....

  3. Energy dependence of the molecular effect in sputtering

    International Nuclear Information System (INIS)

    Oliva-Florio, A.R.; Alonso, E.V.; Baragiola, R.A.; Ferron, J.; Jakas, M.M.

    1979-01-01

    Measurements are reported of sputtering yields of Au for Xe + and Xe 2 + impact in the energy range 1 to 50 keV. It was found that non-linear effects exist well outside the range predicted in a recent thermal spike model. (author)

  4. Energy dependence of the molecular effect in sputtering

    International Nuclear Information System (INIS)

    Oliva-Florio, A.R.; Alonso, E.V.; Baragiola, R.A.; Ferron, J.; Jakas, M.M.

    1979-01-01

    Measurements of sputtering yields of Au for Xe + and Xe + 2 impact in the energy range 1-50 keV are given. It was found that non-linear effects exist well outside the range predicted in a recent thermal spike model. (author)

  5. Towards a magnetic field separation in Ion Beam Sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Malobabic, Sina, E-mail: s.malobabic@lzh.de [Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover (Germany); Quest: Centre of Quantum Engineering and Space-Time Research, Leibniz Universität Hannover (Germany); Jupé, Marco [Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover (Germany); Quest: Centre of Quantum Engineering and Space-Time Research, Leibniz Universität Hannover (Germany); Kadhkoda, Puja [Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover (Germany); Ristau, Detlev [Laser Zentrum Hannover e.V., Hollerithallee 8, 30419 Hannover (Germany); Quest: Centre of Quantum Engineering and Space-Time Research, Leibniz Universität Hannover (Germany)

    2015-10-01

    Defects embedded in coatings due to particle contamination are considered as a primary factor limiting the quality of optical coatings in Ion Beam Sputtering. An approach combining the conventional Ion Beam Sputtering process with a magnetic separator in order to remove these particles from film growth is presented. The separator provides a bent axial magnetic field that guides the material flux towards the substrate positioned at the exit of the separator. Since there is no line of sight between target and substrate, the separator prevents that the particles generated in the target area can reach the substrate. In this context, optical components were manufactured that reveal a particle density three times lower than optical components which were deposited using a conventional Ion Beam Sputtering process. - Highlights: • We use bent magnetic fields to guide and separate the sputtered deposition material. • No line of sight between substrate and target prevents thin films from particles. • The transport efficiency of binary and ternary oxides is investigated. • The defect statistics of manufactured dielectric ternary multilayers are evaluated. • The phase separation leads to a drastically reduction of particle contamination.

  6. Modular design of AFM probe with sputtered silicon tip

    DEFF Research Database (Denmark)

    Rasmussen, Peter; Thaysen, Jacob; Bouwstra, Siebe

    2001-01-01

    of the thin films constituting the cantilever. The AFM probe has an integrated tip made of a thick sputtered silicon layer, which is deposited after the probe has been defined and just before the cantilevers are released. The tips are so-called rocket tips made by reactive ion etching. We present probes...

  7. Sputtered thin films for high density tape recording

    NARCIS (Netherlands)

    Nguyen, L.T.

    This thesis describes the investigation of sputtered thin film media for high density tape recording. As discussed in Chapter 1, to meet the tremendous demand of data storage, the density of recording tape has to be increased continuously. For further increasing the bit density the key factors are:

  8. Basic electrochemical properties of sputtered gold film electrodes

    International Nuclear Information System (INIS)

    Libansky, Milan; Zima, Jiri; Barek, Jiri; Reznickova, Alena; Svorcik, Vaclav; Dejmkova, Hana

    2017-01-01

    Gold nanolayers made by sputtering of pure gold (physical vapour deposition) are commonly used for many biophysical and material applications. However, the use of sputtering method for fabrication of working electrodes for electroanalytical purposes is less common. This paper focuses on the testing and characterization of sputtered working roughened gold nanostructured film electrodes, which fall into category of upcoming desirable new generation of nanostructured gold working electrodes. Gold nanostructured films (80 nm thin) were sputtered onto 50 μm thin PTFE substrates with three different types of treatment: pristine, plasma treated, and plasma treated and subsequently spontaneously grafted with biphenyl-4,4′-dithiol. The characterization of gold nanostructured film electrodes was carried out by examination of the electrode reaction of standard redox probes (ferrocyanide/ferricyanide, hydroquinone/benzoquinone) in different types of supporting electrolytes (BR buffers of various pH, KCl, KNO 3 , H 2 SO 4 ), by exploration of the electrode surface by scanning electron microscopy, by atomic force microscopy accompanied by elementary analysis and contact angle measurements. The testing of electrodes was complemented by an attempt to calculate their real surface areas from Randles-Sevcik equation. All results were compared to conventional bulk gold electrode. The practical applicability of the nanostructured gold electrodes as sensors for the determination of environmental pollutants was verified by voltammetric determination of hydroquinone as a model electrochemically oxidisable organic environmental pollutant.

  9. Development of ion beam sputtering techniques for actinide target preparation

    Science.gov (United States)

    Aaron, W. S.; Zevenbergen, L. A.; Adair, H. L.

    1985-06-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of a minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity actinides in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed.

  10. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

  11. Particle dynamics during electronic sputtering of solid krypton

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    We have modeled electronic sputtering of solid krypton by excimer production with molecular dynamics. Both excimer evolution in the solid and deexcitation processes have been incorporated in the simulation. The excimer dynamics in the lattice has been analyzed: the excimers formed near the surface...

  12. Preparation of boron-nitrogen films by sputtering

    International Nuclear Information System (INIS)

    Klose, S.; Winde, B.

    1980-01-01

    Hard boron-nitrogen films adherent to various substrates can be prepared by sputtering. IR investigations suggest the existence of cubic boron nitride in certain layers. Transmission electron microscope studies have shown a quasi-amorphous structure irregularly incorporating crystallites of zinc blende structure of some nm in diameter

  13. Doubly Charged Ion Emission in Sputtering of Monocrystalline Fluorides

    Czech Academy of Sciences Publication Activity Database

    Lörinčík, Jan; Šroubek, Zdeněk

    2002-01-01

    Roč. 187, - (2002), s. 447-450 ISSN 0168-583X R&D Projects: GA ČR GA202/99/0881; GA AV ČR IAA1067801 Institutional research plan: CEZ:AV0Z4040901 Keywords : secondary ion emission * doubly charged * sputtering Subject RIV: CF - Physical ; Theoretical Chemistry Impact factor: 1.158, year: 2002

  14. Oblique sputtered and evaporated magnetic thin films for tape recording

    NARCIS (Netherlands)

    Bijker, M.D.

    1998-01-01

    After having introduced some aspects of tape recording in chapter one, chapter two deals with the magnetron sputtering process itself. The kinetic energy of the electrons which are bound to the groove region by the combined action of the B and E field, was calculated. It was found that for a

  15. Inhomogeneous strain states in sputter deposited tungsten thin films

    International Nuclear Information System (INIS)

    Noyan, I.C.; Shaw, T.M.; Goldsmith, C.C.

    1997-01-01

    The results of an x-ray diffraction study of dc-magnetron sputtered tungsten thin films are reported. It is shown that the phase transformation from the β to α W can cause multilayered single-phase films where the layers have very different stress states even if the films are in the 500 nm thickness range. copyright 1997 American Institute of Physics

  16. Physicochemical model for reactive sputtering of hot target

    Energy Technology Data Exchange (ETDEWEB)

    Shapovalov, Viktor I., E-mail: vishapovalov@mail.ru; Karzin, Vitaliy V.; Bondarenko, Anastasia S.

    2017-02-05

    A physicochemical model for reactive magnetron sputtering of a metal target is described in this paper. The target temperature in the model is defined as a function of the ion current density. Synthesis of the coating occurs due to the surface chemical reaction. The law of mass action, the Langmuir isotherm and the Arrhenius equation for non-isothermal conditions were used for mathematical description of the reaction. The model takes into consideration thermal electron emission and evaporation of the target surface. The system of eight algebraic equations, describing the model, was solved for the tantalum target sputtered in the oxygen environment. It was established that the hysteresis effect disappears with the increase of the ion current density. - Highlights: • When model is applied for a cold target, hysteresis width is proportional to the ion current density. • Two types of processes of hot target sputtering are possible, depending on the current density: with and without the hysteresis. • Sputtering process is dominant at current densities less than 50 A/m{sup 2} and evaporation can be neglected. • For current densities over 50 A/m{sup 2} the hysteresis width reaches its maximum and the role of evaporation increases.

  17. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  18. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    Czech Academy of Sciences Publication Activity Database

    Martines, E.; Zuin, M.; Cavazzana, R.; Adámek, Jiří; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.

    2014-01-01

    Roč. 21, č. 10 (2014), s. 102309-102309 ISSN 1070-664X Institutional support: RVO:61389021 Keywords : Drift waves * Magnetron sputtering plasma * Spatiotemporal synchronization Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.142, year: 2014 http://dx.doi.org/10.1063/1.4898693

  19. Investigation of ion sputtering for eutectic Cu-37 at% Ag alloys

    International Nuclear Information System (INIS)

    Wang Zhenxia; Pan Jisheng; Zhang Jiping; Tao Zhenlan; Zhu Fuying; Zhao Lie; Zhang Huiming

    1994-01-01

    Angular distributions of sputtered atoms and the phenomenon of element locally rich relative to micro-topographic feature (ELR-MTF) of sputtered target surface have been investigated for Cu-37 at% Ag alloys by means of RBS, SEM and EPMA measurements. In the paper,emphasis will be put on the correlation between surface topography caused by Ar + ion bombardment with different doses and angular distribution of sputtered atoms ejecting from various micro-zones at topographical surface during sputtering. The experiment result was explained with the so-called ELR-MTF model which can qualitatively interpret the shape of the angular distributions and the variation of the preferential sputtering curves

  20. Low-damage high-throughput grazing-angle sputter deposition on graphene

    Energy Technology Data Exchange (ETDEWEB)

    Chen, C.-T.; Gajek, M.; Raoux, S. [IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598 (United States); Casu, E. A. [IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598 (United States); Politecnico di Torino, Turin 10129 (Italy)

    2013-07-15

    Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications.

  1. Low-damage high-throughput grazing-angle sputter deposition on graphene

    International Nuclear Information System (INIS)

    Chen, C.-T.; Gajek, M.; Raoux, S.; Casu, E. A.

    2013-01-01

    Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications

  2. Low-damage high-throughput grazing-angle sputter deposition on graphene

    Science.gov (United States)

    Chen, C.-T.; Casu, E. A.; Gajek, M.; Raoux, S.

    2013-07-01

    Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications.

  3. Comparative study of the characteristics of Ni films deposited on SiO2/Si(100) by oblique-angle sputtering and conventional sputtering

    International Nuclear Information System (INIS)

    Yu Mingpeng; Qiu Hong; Chen Xiaobai; Wu Ping; Tian Yue

    2008-01-01

    Ni films were deposited on SiO 2 /Si(100) substrates at 300 K and 573 K by oblique-angle sputtering and conventional sputtering. The films deposited at 300 K mainly have a [110] crystalline orientation in the growing direction whereas those deposited at 573 K grow with a [111] crystalline orientation in the growing direction. The film prepared only at 300 K by oblique-angle sputtering grows with a weakly preferential orientation along the incidence direction of the sputtered Ni atoms. All the films grow with thin columnar grains perpendicular to the substrate surface. The grain size of the films sputter-deposited obliquely is larger than that of the films sputter-deposited conventionally. The grain size of the Ni film does not change markedly with the deposition temperature. The film deposited at 573 K by oblique-angle sputtering has the highest saturation magnetization. For the conventional sputtering, the coercivity of the Ni film deposited at 573 K is larger than that of the film deposited at 300 K. However, for the oblique-angle sputtering, the coercivity of the Ni film is independent of the deposition temperature. All the Ni films exhibit an isotropic magnetization characteristic in the film plane

  4. Study of the ion sputter-machining, 1

    International Nuclear Information System (INIS)

    Miyamoto, Iwao; Taniguchi, Norio

    1979-01-01

    A lattice disordering of the surface of single crystal silicon due to ion bombardment of Ar + was investigated by the high energy electron diffraction method, with the incident angle of 1.7 0 and 2.8 0 . By this measuring system, the degree of disorders of the sputter-machined surface layer of Si single crystal in the depth of 50 A and 30 A has been determined, under the working conditions of the ion energy ranging from 0.2 keV to 1.5 keV and the incident angle of ion ranging from 0 0 to 75 0 . Moreover, the recovery of lattice disorder of sputter-machined surface layer of Si single crystal by means of the isochronal thermal annealing has been also confirmed by the same method. From the above experiments, the following conclusions are obtained. (1) The layers of sputter-machined surface of Si single crystal workpiece are highly disordered like amorphous, under the working conditions of ion energy ranging from 0.2 keV to 1.5 keV for the vertical ion incident angle. (2) Under the working conditions of ion incident angle larger than 60 0 , using the ion beam with a lower energy under 300 eV, the surface of the workpiece is not disordered. Therefore, a sputter-machined surface of Si single crystal with highly ordered structure can be obtained under this working condition. (3) The recovery of disorder of sputter-machined surface is completed by the heat-treatment of workpiece under isochronal annealing for 1 hour at 800 0 C. However, it is not clear whether this recovery of lattice point or the dispersion of interstitially located argon atoms from the surface to the outside. (author)

  5. Position resolution of MSGCs with cathode readout

    International Nuclear Information System (INIS)

    Amos, N.; Cremaldi, L.; Finocchiaro, G.; Gobbi, B.; Ng, K.K.; Manzella, V.; Peskov, V.; Rajagopalan, S.; Rubinov, P.; Schamberger, D.; Sellberg, G.; Steffens, J.; Tilden, R.; Wang, P.; Yu, Y.

    1997-01-01

    The performance of a telescope of micro-strip gas chambers (MSGC) has been studied in a beam of pions. Detectors with different anode pitch and with different substrates have been operated using several gas mixtures. The position resolutions obtained by reading out the cathodes for the 200 μm pitch is 42 μm. For the 400 μm pitch detectors the resolution is 42 μm after correcting the centroid positions with a function derived from the data. (orig.)

  6. Coated particles for lithium battery cathodes

    Science.gov (United States)

    Singh, Mohit; Eitouni, Hany Basam; Pratt, Russell Clayton; Mullin, Scott Allen; Wang, Xiao-Liang

    2017-07-18

    Particles of cathodic materials are coated with polymer to prevent direct contact between the particles and the surrounding electrolyte. The polymers are held in place either by a) growing the polymers from initiators covalently bound to the particle, b) attachment of the already-formed polymers by covalently linking to functional groups attached to the particle, or c) electrostatic interactions resulting from incorporation of cationic or anionic groups in the polymer chain. Carbon or ceramic coatings may first be formed on the surfaces of the particles before the particles are coated with polymer. The polymer coating is both electronically and ionically conductive.

  7. Low noise PWC cathode readout system

    International Nuclear Information System (INIS)

    Cisneros, E.; Hutchinson, D.; McShurley, D.; Richter, R.; Shapiro, S.

    1980-10-01

    A system has been developed, primarily to detect the induced charge deposited on PWC cathodes, which is versatile, fast and has a good signal to noise ratio for signals of greater than or equal to 10 -14 Coulomb input. The amplifier system, which is completely separated from the detector by 95 Ω coaxial cables, is followed by a new charge integrating, version of the SHAM/BADC system developed at SLAC. This SHAM IV system is CAMAC based, allowing for computer calibration of the entire system from amplifier through ADC

  8. Cathode Readout with Stripped Resistive Drift Tubes

    International Nuclear Information System (INIS)

    Bychkov, V.N.; Kekelidze, G.D.; Novikov, E.A.; Peshekhonov, V.D.; Shafranov, M.D.; Zhil'tsov, V.E.

    1994-01-01

    A straw tube drift chamber prototype has been constructed and tested. The straw tube material is mylar film covered with carbon layer of resistivity 0.5, 30 and 70 k Ohm/sq. The gas mixture used was Ar/CH 4 . Both the anode wire and cathode signals were detected in order to study the behaviour of the chamber in the presence of X-ray ionization. The construction and the results of the study are presented. 7 refs., 11 figs., 1 tab

  9. Solid oxide fuel cells with apatite-type lanthanum silicate-based electrolyte films deposited by radio frequency magnetron sputtering

    Science.gov (United States)

    Liu, Yi-Xin; Wang, Sea-Fue; Hsu, Yung-Fu; Wang, Chi-Hua

    2018-03-01

    In this study, solid oxide fuel cells (SOFCs) containing high-quality apatite-type magnesium doped lanthanum silicate-based electrolyte films (LSMO) deposited by RF magnetron sputtering are successfully fabricated. The LSMO film deposited at an Ar:O2 ratio of 6:4 on an anode supported NiO/Sm0.2Ce0·8O2-δ (SDC) substrate followed by post-annealing at 1000 °C reveals a uniform and dense c-axis oriented polycrystalline structure, which is well adhered to the anode substrate. A composite SDC/La0·6Sr0·4Co0·2Fe0·8O3-δ cathode layer is subsequently screen-printed on the LSMO deposited anode substrate and fired. The SOFC fabricated with the LSMO film exhibits good mechanical integrity. The single cell with the LSMO layer of ≈2.8 μm thickness reports a total cell resistance of 1.156 and 0.163 Ωcm2, open circuit voltage of 1.051 and 0.982 V, and maximum power densities of 0.212 and 1.490 Wcm-2 at measurement temperatures of 700 and 850 °C, respectively, which are comparable or superior to those of previously reported SOFCs with yttria stabilized zirconia electrolyte films. The results of the present study demonstrate the feasibility of deposition of high-quality LSMO films by RF magnetron sputtering on NiO-SDC anode substrates for the fabrication of SOFCs with good cell performance.

  10. Cesium-incorporated indium-tin-oxide films for use as a cathode with low work function for a transparent organic light-emitting device

    International Nuclear Information System (INIS)

    Uchida, Takayuki; Mimura, Toshifumi; Ohtsuka, Masao; Otomo, Toshio; Ide, Mieko; Shida, Azusa; Sawada, Yutaka

    2006-01-01

    Transparent organic light-emitting devices (TOLEDs) were successfully fabricated utilizing a novel transparent conducting cathode with low work function. Cesium-incorporated indium-tin-oxide film was deposited on the organic layers with negligible damage by simultaneous operation of RF magnetron sputtering using an ITO target and vacuum evaporation of metallic cesium. Incorporation of cesium in the ITO film was confirmed by XPS analysis. The work function (4.3 eV) determined by photoelectron spectroscopy in air (PESA) was lower than that of 0.3-0.4-eV without cesium-incorporation and stable under the atmospheric environment. The electron injection efficiency of cesium-incorporated ITO cathode in the present transparent OLED fabricated was comparable to that of the previous double-layered structure comprising of ITO cathode and an organic buffer layer (BCP) doped by evaporation of cesium [T. Uchida, S. Kaneta, M. Ichihara, M. Ohtsuka, T. Otomo, D.R. Marx, Jpn. J. Appl. Phys., 44, No. 9 (2005) L282

  11. Tailored Core Shell Cathode Powders for Solid Oxide Fuel Cells

    Energy Technology Data Exchange (ETDEWEB)

    Swartz, Scott [NexTech Materials, Ltd.,Lewis Center, OH (United States)

    2015-03-23

    In this Phase I SBIR project, a “core-shell” composite cathode approach was evaluated for improving SOFC performance and reducing degradation of lanthanum strontium cobalt ferrite (LSCF) cathode materials, following previous successful demonstrations of infiltration approaches for achieving the same goals. The intent was to establish core-shell cathode powders that enabled high performance to be obtained with “drop-in” process capability for SOFC manufacturing (i.e., rather than adding an infiltration step to the SOFC manufacturing process). Milling, precipitation and hetero-coagulation methods were evaluated for making core-shell composite cathode powders comprised of coarse LSCF “core” particles and nanoscale “shell” particles of lanthanum strontium manganite (LSM) or praseodymium strontium manganite (PSM). Precipitation and hetero-coagulation methods were successful for obtaining the targeted core-shell morphology, although perfect coverage of the LSCF core particles by the LSM and PSM particles was not obtained. Electrochemical characterization of core-shell cathode powders and conventional (baseline) cathode powders was performed via electrochemical impedance spectroscopy (EIS) half-cell measurements and single-cell SOFC testing. Reliable EIS testing methods were established, which enabled comparative area-specific resistance measurements to be obtained. A single-cell SOFC testing approach also was established that enabled cathode resistance to be separated from overall cell resistance, and for cathode degradation to be separated from overall cell degradation. The results of these EIS and SOFC tests conclusively determined that the core-shell cathode powders resulted in significant lowering of performance, compared to the baseline cathodes. Based on the results of this project, it was concluded that the core-shell cathode approach did not warrant further investigation.

  12. The influence of landing points on the sputtering of mono-crystal solids due to cluster impacting

    Energy Technology Data Exchange (ETDEWEB)

    Niu, Guo-jian; Li, Xiao-chun; Xu, Qian; Yang, Zhong-shi, E-mail: zsyang@ipp.ac.cn; Luo, Guang-nan, E-mail: gnluo@ipp.ac.cn

    2017-01-15

    The mechanism of sputtering due to cluster impacting which has been widely studied is an important but unsolved problem. In present research, we discuss the effect of the landing point on the sputtering with the method of molecular dynamics. The results show that the landing points play significant roles on sputter yield when the temperature of target is low. Specific landing points can cause particular sputtering patterns which lead to different sputtering yield and moving directions of sputtered atoms. The mechanism of this phenomenon is that specific landing keeps symmetries and anisotropies of target lattice, which influence the sputtering yield.

  13. Depth of origin of sputtered atoms: Experimental and theoretical study of Cu/Ru(0001)

    International Nuclear Information System (INIS)

    Burnett, J.W.; Biersack, J.P.; Gruen, D.M.; Joergensen, B.; Krauss, A.R.; Pellin, M.J.; Schweitzer, E.L.; Yates, J.T. Jr.; Young, C.E.

    1987-01-01

    The depth of origin of sputtered atoms is a subject of considerable interest. The surface sensitivity of analytical techniques such as Secondary Ion Mass Spectrometry (SIMS) and Surface Analysis by Resonance Ionization of Sputtered Atoms (SARISA), and the sputtering properties of strongly segregating alloy systems, are critically dependent on the sputtering depth of origin. A significant discrepancy exists between the predictions of the Sigmund theory and computer sputtering models; in general, the computer models predict a much shallower depth of origin. The existing experimental evidence suggests that most of the sputtered atoms originate in the topmost atomic layer, but until recently, the results have not been definitive. We have experimentally determined the depth of origin of atoms sputtered from surfaces consisting of Cu films of less than two monolayers on a Ru(0001) substrate. The Cu/Ru target was statically sputtered using 3.6 keV Ar + . The sputtered neutrals were non-resonantly laser ionized and detected using SARISA. The Cu/Ru sputtering yield ratio and the suppression of the Ru sputtering yield were determined for various Cu coverages. The results indicate that the majority of the sputtered atoms originate in the topmost atomic layer. The Cu/Ru system is also modeled using a modified Transport of Ions in Matter (TRIM) code. It was found that TRIM C does not correctly treat the first atomic layer, resulting in a serious underestimate of the number of sputtered atoms which originate in this layer. The corrected version adequately describes the results, predicting that for the experimental conditions roughly two-thirds of the sputtered atoms originate in the first atomic layer. These results are significantly greater than the Sigmund theory estimate of >40%. 26 refs., 3 figs., 1 tab

  14. Contributions of solar-wind induced potential sputtering to the lunar surface erosion rate and it's exosphere

    Science.gov (United States)

    Alnussirat, S. T.; Barghouty, A. F.; Edmunson, J. E.; Sabra, M. S.; Rickman, D. L.

    2018-04-01

    Sputtering of lunar regolith by solar-wind protons and heavy ions with kinetic energies of about 1 keV/amu is an important erosive process that affects the lunar surface and exosphere. It plays an important role in changing the chemical composition and thickness of the surface layer, and in introducing material into the exosphere. Kinetic sputtering is well modeled and understood, but understanding of mechanisms of potential sputtering has lagged behind. In this study we differentiate the contributions of potential sputtering from the standard (kinetic) sputtering in changing the chemical composition and erosion rate of the lunar surface. Also we study the contribution of potential sputtering in developing the lunar exosphere. Our results show that potential sputtering enhances the total characteristic sputtering erosion rate by about 44%, and reduces sputtering time scales by the same amount. Potential sputtering also introduces more material into the lunar exosphere.

  15. Magnetron with flux switching cathode and method of operation

    Science.gov (United States)

    Aaron, D.B.; Wiley, J.D.

    1989-09-12

    A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

  16. Evaluation of the electrical conductivity and corrosion resistance for layers deposited via sputtering on stainless steel

    Science.gov (United States)

    Blanco, J.; Salas, Y.; Jiménez, C.; Pineda, Y.; Bustamante, A.

    2017-12-01

    In some Engineering fields, we need that conductive materials have a mechanic performance and specific electrical for that they maintain conditions or corrosive attack if they are in the environment or if they are closed structure. The stainless steels have an inert film on their surface and it has the function to act in contrast to external agents who generates the corrosion, especially for stings, spoiling the film until to fail. We found a solution taking into account the electrical performance and the anticorrosive; into the process we put recovering of specific oxides on, stainless steel using the method of sputtering with Unbalanced Magnetron, (UBM) varying the oxygen in the reactive environment. The coating obtained had a thickness one micron approximately and we saw on serious structural uniformity [1]. The corrosion resistance was evaluated through the potentiodynamics polarization and electrochemical spectroscopy impedance in NACL according to the standard. The cathode protection is the most important method employed for the corrosion prevention of metallic structures in the soil or immersed on the water. The electrical resistivity was evaluated with the four points methods and it showed a behaviour of diode type in some substrates with a threshold potential in several volts. We noticed a simple resistance solution when it was analysed in the Nyquist graphics whit the Electrochemical Impedance Spectroscopy technique. With on equivalent circuit, for this reason we determinate a variation in the corrosion speed in almost two orders of magnitude when we analysed the potentiodynamics curve by Tafel approximation. The data obtained and analysed show that this type of surface modification maintains the conductivity condition at the interface, improving the resistance in relation whit the corrosion of these elements where the recovering allowed the ionic flow wished for overcoming threshold voltage, acting as an insulator in different cases.

  17. Computer investigations of the influences of magnets for magnetron-sputtering

    International Nuclear Information System (INIS)

    Knotek, O.; Loeffler, F.; Schnaut, U.; Guan, W.

    1993-01-01

    For a long time PVD (Physical-Vapour-Deposition) technology has been applied in various modern technical fields, owing to the wide range of possible coating materials whose potential is virtually unlimited. Besides electronic, optical and decorative applications for PVD films, hard films, in particular, have been widely applied for tool coatings which play important roles for the resistance against wear and corrosion. The MSIP (Magnetron-Sputter-Ion-Plating) coating process is one of the PVD-processes, providing 1) relatively high deposition rates, 2) large deposition areas, and 3) low substrate heating. The magnetron behind the target influences the distribution of the electrons moving in the plasma and the space between the cathode and anode, thus the distribution of the ions impinging on the surface of the target. Since the electrons are distributed unevenly in front of the target, the working gas atoms are therefore unevenly ionized in the plasma and the ions also unevenly bombard the target surface and the erosion of the target surface is uneven. Therefore the investigations of the magnetic field in the MSIP are very important for the optimization of the deposition process and the usage of the target. Generally, the accurate calculations or measurements of the direction and strength of the magnetic field (magnetic induction or magnetic flux density vector B) is difficult in comparison to measurements of the electrical field, because vector B is a vector with varying direction and magnitude. In this paper, it is shown that a magnetic field of a cylindrical magnetron in MSIP-equipment can be quickly simulated through a simple model and the distribution of the field is discussed. (orig.)

  18. Magneto-optical properties of yttrium iron garnet (YIG) thin films elaborated by radio frequency sputtering

    International Nuclear Information System (INIS)

    Boudiar, T.; Payet-Gervy, B.; Blanc-Mignon, M.-F.; Rousseau, J.-J.; Le Berre, M.; Joisten, H.

    2004-01-01

    Thin films of yttrium iron garnet (YIG) are grown by radio frequency magnetron non reactive sputtering system. Thin films are crystallised by heat-treatment to obtain magneto-optical properties. On quartz substrate, the network of cracks observed on the annealed samples can be explained by the difference between the thermal expansion coefficient of substrate and YIG. Physico-chemical analysis shown that the obtained material has a correct stoichiometry and is crystallised as FCC. The Faraday rotation of thin films is measured with a classical ellipsometric system based on transmission which allows us to obtained an accuracy of 0.01 deg. The variation of Faraday rotation is studied on the one hand versus radio frequency power applied to the cathode during the deposition and on the other hand versus the applied magnetic field. The results are compared with those obtained by vibrating sample magnetometer analysis in perpendicular configuration. A maximum Faraday rotation is observed to be 1900 deg./cm at the wavelength of 594nm for a YIG thin film formed on quartz substrate and annealed at 740 deg. C. The values of the Faraday rotation coefficients obtained in the study versus the wavelength are comparable to those of the literature for the bulk material. In order to eliminate the stress due to the heat-treatment, we made some films on single crystals of gadolinium gallium garnet (111) substrates for which thermal expansion coefficient is near than the YIG one. The material crystallises with no crackles and the Faraday effect is equivalent

  19. Experimental and ab initio investigations on textured Li–Mn–O spinel thin film cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, J., E-mail: Julian.Fischer@kit.edu [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Music, D. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 52074 Aachen (Germany); Bergfeldt, T.; Ziebert, C.; Ulrich, S.; Seifert, H.J. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2014-12-01

    This paper describes the tailored preparation of nearly identical lithium–manganese–oxide thin film cathodes with different global grain orientations. The thin films were synthesized by rf magnetron sputtering from a LiMn{sub 2}O{sub 4}-target in a pure argon plasma. Under appropriate processing conditions, thin films with a cubic spinel structure and a nearly similar density and surface topography but different grain orientation, i.e. (111)- and (440)-textured films, were achieved. The chemical composition was determined by inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The constitution- and microstructure were evaluated by X-ray diffraction and Raman spectroscopy. The surface morphology and roughness were investigated by scanning electron and atomic force microscopy. The differently textured films represent an ideal model system for studying potential effects of grain orientation on the lithium ion diffusion and electrochemical behavior in LiMn{sub 2}O{sub 4}-based thin films. They are nearly identical in their chemical composition, atomic bonding behavior, surface-roughness, morphology and thickness. Our initial ab initio molecular dynamics data indicate that Li ion transport is faster in (111)-textured structure than in (440)-textured one. - Highlights: • Thin film model system of differently textured cubic Li–Mn–O spinels. • Investigation of the Li–Mn–O thin film mass density by X-ray reflectivity. • Ab initio molecular dynamics simulation on Li ion diffusion in LiMn{sub 2}O{sub 4}.

  20. Experimental and ab initio investigations on textured Li–Mn–O spinel thin film cathodes

    International Nuclear Information System (INIS)

    Fischer, J.; Music, D.; Bergfeldt, T.; Ziebert, C.; Ulrich, S.; Seifert, H.J.

    2014-01-01

    This paper describes the tailored preparation of nearly identical lithium–manganese–oxide thin film cathodes with different global grain orientations. The thin films were synthesized by rf magnetron sputtering from a LiMn 2 O 4 -target in a pure argon plasma. Under appropriate processing conditions, thin films with a cubic spinel structure and a nearly similar density and surface topography but different grain orientation, i.e. (111)- and (440)-textured films, were achieved. The chemical composition was determined by inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The constitution- and microstructure were evaluated by X-ray diffraction and Raman spectroscopy. The surface morphology and roughness were investigated by scanning electron and atomic force microscopy. The differently textured films represent an ideal model system for studying potential effects of grain orientation on the lithium ion diffusion and electrochemical behavior in LiMn 2 O 4 -based thin films. They are nearly identical in their chemical composition, atomic bonding behavior, surface-roughness, morphology and thickness. Our initial ab initio molecular dynamics data indicate that Li ion transport is faster in (111)-textured structure than in (440)-textured one. - Highlights: • Thin film model system of differently textured cubic Li–Mn–O spinels. • Investigation of the Li–Mn–O thin film mass density by X-ray reflectivity. • Ab initio molecular dynamics simulation on Li ion diffusion in LiMn 2 O 4

  1. Surface treatment in a cathodic arc plasma. Key step for interface engineering

    International Nuclear Information System (INIS)

    Schoenjahn, C.

    2001-02-01

    The effect of substrate surface treatment (substrate sputter cleaning) in a cathodic arc plasma prior to unbalanced magnetron deposition of transition metal nitride coatings on the performance of the coated components has been investigated. In particular the influence of parameters such as ion species, ion energy and exposure time on the changes in substrate surface topography, microstructure and microchemistry were studied employing transmission electron microscopy, energy dispersive X-ray analysis, electron energy loss spectroscopy, X-ray diffraction, atomic force microscopy and optical microscopy. The consequences for both the microstructure of subsequently grown transition metal nitride coatings and their adhesion were elucidated. The relevance for practical applications was demonstrated using the example of dry high-speed milling tests, which showed that an appropriate choice of substrate surface pre-treatment parameters can double the life time of the coated tools. This was found to be due to an improved adhesion as a result of a combination of reduced oxygen incorporation at the interface between coating and substrate and local epitaxial growth of the coating. The latter is promoted by certain substrate surface pre-treatment procedures, which provide clean surfaces with preserved crystallographic order. (author)

  2. Raman Spectroscopy of DLC/a-Si Bilayer Film Prepared by Pulsed Filtered Cathodic Arc

    Directory of Open Access Journals (Sweden)

    C. Srisang

    2012-01-01

    Full Text Available DLC/a-Si bilayer film was deposited on germanium substrate. The a-Si layer, a seed layer, was firstly deposited on the substrate using DC magnetron sputtering and DLC layer was then deposited on the a-Si layer using pulsed filtered cathodic arc method. The bilayer films were deposited with different DLC/a-Si thickness ratios, including 2/2, 2/6, 4/4, 6/2, and 9/6. The effect of DLC/a-Si thickness ratios on the sp3 content of DLC was analyzed by Raman spectroscopy. The results show that a-Si layer has no effect on the structure of DLC film. Furthermore, the upper shift in G wavenumber and the decrease in ID/IG inform that sp3 content of the film is directly proportional to DLC thickness. The plot modified from the three-stage model informed that the structural characteristics of DLC/a-Si bilayer films are located close to the tetrahedral amorphous carbon. This information may be important for analyzing and developing bilayer protective films for future hard disk drive.

  3. Space-time-dependent development of the plasma in a pulsed hollow-cathode discharge

    International Nuclear Information System (INIS)

    Schaefer, G.; Wages, M.

    1988-01-01

    This paper presents streak camera investigations on the space-time-dependent development of pulsed hollow-cathode discharges (HCD's) starting from low-current preionization discharges. The discharges started closer to the end of the cathode, then moved further into the cathode, and then spread over a longer range along the axis of the cathode. The depth range of the intense pulsed hollow-cathode plasma was found to be two to eight times the cathode diameter

  4. Compact open cathode feed system for PEMFCs

    International Nuclear Information System (INIS)

    Ling, C.Y.; Cao, H.; Chen, Y.; Han, M.; Birgersson, E.

    2016-01-01

    Highlights: • Two different modes of feeding air into an open cathode PEMFC stack were studied. • Drawing air, as opposed to blowing air, into the stack results in more uniform air velocities entering the stack. • The uniform inlet velocities help maintain a more even temperature distribution field. • A 16% increase in power output is observed by drawing air into the stack. - Abstract: The open cathode design is commonly adopted for small sized proton exchange membrane fuel cells (PEMFCs) as it allows for smaller footprint and thus, higher power density. Axial fans are typically used to supply oxygen in these PEMFC systems. Apart from controlling stoichiometry, they also play a critical role in regulating internal temperature. This suggests that its location could have significant impact on fuel cell performance. In this work, the location of the fan is varied from the front to the rear in order to blow air or draw air into the stack respectively. The latter configuration reduces the non-uniformity in temperature and velocity by around 2 and 4 times respectively, resulting in a 16% increase in overall stack performance.

  5. Kinetic and Potential Sputtering of Lunar Regolith: The Contribution of the Heavy Highly Charged (Minority) Solar Wind Ions

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    Solar wind sputtering of the lunar surface helps determine the composition of the lunar exosphere and contributes to surface weathering. To date, only the effects of the two dominant solar wind constituents, H+ and He+, have been considered. The heavier, less abundant solar wind constituents have much larger sputtering yields because they have greater mass (kinetic sputtering) and they are highly charged (potential sputtering) Their contribution to total sputtering can therefore be orders of magnitude larger than their relative abundances would suggest

  6. Influence of substrate topography on cathodic delamination of anticorrosive coatings

    DEFF Research Database (Denmark)

    Sørensen, Per Aggerholm; Kiil, Søren; Dam-Johansen, Kim

    2009-01-01

    and thereby the substrate topography, whereas the coating thickness had little influence. The presence of a significant potential gradient between the anode and the cathode and the dependency of the delamination rate on the tortuosity of the steel surface suggests that cathodic delamination is controlled...

  7. The Effect of Substrate Topography on Coating Cathodic Delamination

    DEFF Research Database (Denmark)

    Erik Weinell, Claus; Sørensen, Per A.; Kiil, Søren

    2011-01-01

    This article describes the effect of steel substrate topography on coating cathodic delamination. The study showed that the surface preparation can be used to control and minimize the rate of cathodic delamination. The coating should have maximum wetting properties so that substrates with high...

  8. Wire winding increases lifetime of oxide coated cathodes

    Science.gov (United States)

    Kerslake, W.; Vargo, D.

    1965-01-01

    Refractory-metal heater base wound with a thin refractory metal wire increases the longevity of oxide-coated cathodes. The wire-wound unit is impregnated with the required thickness of metal oxide. This cathode is useful in magnetohydrodynamic systems and in electron tubes.

  9. Cathodic disbonding of organic coatings on submerged steel

    Energy Technology Data Exchange (ETDEWEB)

    Knudsen, Ole oeystein

    1998-12-31

    In offshore oil production, submerged steel structures are commonly protected by an organic coating in combination with cathodic protection. The main advantage is that the coating decreases the current demand for cathodic protection. But the coating degrades with time. This thesis studies one of the most important mechanisms for coating degradation in seawater, cathodic disbonding. Seven commercial coatings and two model coatings with various pigmentations have been studied. Parameter studies, microscopy and studies of free films were used in the mechanism investigations. Exposure to simulated North Sea conditions was used in the performance studies. The effect of aluminium and glass barrier pigments on cathodic disbonding was investigated. The mechanism for the effect of the aluminium pigments on cathodic disbonding was also investigated. The transport of charge and oxygen to the steel/coating interface during cathodic disbonding was studied for two epoxy coatings. Cathodic disbonding, blistering and current demand for cathodic protection was measured for nine commercial coatings for submerged steel structures, using the ASTM-G8 standard test and a long term test under simulated North Sea conditions. The relevance of the ASTM-G8 test as a prequalification test was evaluated. 171 refs., 40 figs., 6 tabs.

  10. Reducing DRIFT backgrounds with a submicron aluminized-mylar cathode

    Science.gov (United States)

    Battat, J. B. R.; Daw, E.; Dorofeev, A.; Ezeribe, A. C.; Fox, J. R.; Gauvreau, J.-L.; Gold, M.; Harmon, L.; Harton, J.; Lafler, R.; Landers, J.; Lauer, R. J.; Lee, E. R.; Loomba, D.; Lumnah, A.; Matthews, J.; Miller, E. H.; Mouton, F.; Murphy, A. St. J.; Paling, S. M.; Phan, N.; Sadler, S. W.; Scarff, A.; Schuckman, F. G.; Snowden-Ifft, D.; Spooner, N. J. C.; Walker, D.

    2015-09-01

    Background events in the DRIFT-IId dark matter detector, mimicking potential WIMP signals, are predominantly caused by alpha decays on the central cathode in which the alpha particle is completely or partially absorbed by the cathode material. We installed a 0.9 μm thick aluminized-mylar cathode as a way to reduce the probability of producing these backgrounds. We study three generations of cathode (wire, thin-film, and radiologically clean thin-film) with a focus on the ratio of background events to alpha decays. Two independent methods of measuring the absolute alpha decay rate are used to ensure an accurate result, and agree to within 10%. Using alpha range spectroscopy, we measure the radiologically cleanest cathode version to have a contamination of 3.3±0.1 ppt 234U and 73±2 ppb 238U. This cathode reduces the probability of producing an RPR from an alpha decay by a factor of 70±20 compared to the original stainless steel wire cathode. First results are presented from a texturized version of the cathode, intended to be even more transparent to alpha particles. These efforts, along with other background reduction measures, have resulted in a drop in the observed background rate from 500/day to 1/day. With the recent implementation of full-volume fiducialization, these remaining background events are identified, allowing for background-free operation.

  11. Cathodic protection -- Addition of 6 anodes to existing rectifier 31

    International Nuclear Information System (INIS)

    Lane, W.M.

    1995-01-01

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system additions are installed, connected, and function as required by project criteria. The cathodic protection system is for the tank farms on the Hanford Reservation. The tank farms store radioactive wastes

  12. Development of cathode material for lithium-ion batteries

    Directory of Open Access Journals (Sweden)

    Rustam Mukhtaruly Turganaly

    2014-08-01

    Full Text Available The electrochemical characteristics of the cathode material coated with carbon layer has been developed. Various carbon coating methods. There  has been carried out a comparative electrochemical analysis of the coated and uncoated with carbon cathode material. 

  13. Plasma-induced field emission study of carbon nanotube cathode

    Directory of Open Access Journals (Sweden)

    Yi Shen

    2011-10-01

    Full Text Available An investigation on the plasma-induced field emission (PFE properties of a large area carbon nanotube (CNT cathode on a 2 MeV linear induction accelerator injector is presented. Experimental results show that the cathode is able to emit intense electron beams. Intense electron beams of 14.9–127.8  A/cm^{2} are obtained from the cathode. The CNT cathode desorbs gases from the CNTs during the PFE process. The fast cathode plasma expansion affects the diode perveance. The amount of outgassing is estimated to be 0.06–0.49  Pa·L, and the ratio of outgassing and electron are roughly calculated to be within the range of 170–350 atoms per electron. The effect of the outgassing is analyzed, and the outgassing mass spectrum of the CNT cathode has been studied during the PFE. There is a significant desorption of CO_{2}, N_{2}(CO, and H_{2} gases, which plays an important role during the PFE process. All the experiments demonstrate that the outgassing plays an important role in the formation of the cathode plasma. Moreover, the characteristic turn-on time of the CNT cathode was measured to be 39 ns.

  14. Cathode refunctionalization as a lithium ion battery recycling alternative

    Science.gov (United States)

    Ganter, Matthew J.; Landi, Brian J.; Babbitt, Callie W.; Anctil, Annick; Gaustad, Gabrielle

    2014-06-01

    An approach to battery end-of-life (EOL) management is developed involving cathode refunctionalization, which enables remanufacturing of the cathode from EOL materials to regain the electrochemical performance. To date, the optimal end-of-life management of cathode materials is based on economic value and environmental impact which can influence the methods and stage of recycling. Traditional recycling methods can recover high value metal elements (e.g. Li, Co, Ni), but still require synthesis of new cathode from a mix of virgin and recovered materials. Lithium iron phosphate (LiFePO4) has been selected for study as a representative cathode material due to recent mass adoption and limited economic recycling drivers due to the low inherent cost of iron. Refunctionalization of EOL LiFePO4 cathode was demonstrated through electrochemical and chemical lithiation methods where the re-lithiated LiFePO4 regained the original capacity of 150-155 mAh g-1. The environmental impact of the new recycling technique was determined by comparing the embodied energy of cathode material originating from virgin, recycled, and refunctionalized materials. The results demonstrate that the LiFePO4 refunctionalization process, through chemical lithiation, decreases the embodied energy by 50% compared to cathode production from virgin materials.

  15. Dynamic Aspects of Solid Solution Cathodes for Electrochemical Power Sources

    DEFF Research Database (Denmark)

    Atlung, Sven; West, Keld; Jacobsen, Torben

    1979-01-01

    Battery systems based on alkali metal anodes and solid solution cathodes,i.e., cathodes based on the insertion of the alkali cation in a "host lattice,"show considerable promise for high energy density storage batteries. Thispaper discusses the interaction between battery requirements...

  16. A Preliminary Study on Cathodic Prevention in Reinforced Mortar

    NARCIS (Netherlands)

    Koleva, D.A.; Van Breugel, K.; Mol, J.M.C.; De Wit, J.H.W.

    2010-01-01

    This work presents the preliminary tests on the performance of cathodic prevention (CPre) in reinforced mortar, subjected to aggressive (10% NaCl environment). Cathodic prevention is an electrochemical technique for minimizing, actually "preventing" any eventual corrosion of the steel bars in

  17. Electrical properties of resistive switches based on Ba1-χSrχTiO3 thin films prepared by RF co-sputtering

    International Nuclear Information System (INIS)

    Marquez H, A.; Hernandez R, E.; Zapata T, M.; Guillen R, J.; Cruz, M. P.; Calzadilla A, O.; Melendez L, M.

    2010-01-01

    In this work, was proposed the use of Ba 1-χ Sr χ TiO 3 (0≤x≤1) thin films for the construction of metal-insulator-metal heterostructures; and their great potential for the development of non-volatile resistance memories (ReRAM) is shown. The deposition of Ba 1-χ Sr χ TiO 3 thin films was done by the RF co-sputtering technique using two magnetron sputtering cathodes with BaTiO 3 and SrTiO 3 targets. The chemical composition (x parameter) in the deposited Ba 1-χ Sr χ TiO 3 thin films was varied through the RF powder applied to the targets. The constructed metal-insulator-metal heterostructures were Al/Ba 1-χ Sr χ TiO 3 /nichrome. The I-V measurements of the heterostructures showed that their hysteretic characteristics change depending on the Ba/Sr ratio of the Ba 1-χ Sr χ TiO 3 thin films; the Ba/Sr ratio was determined by employing the energy dispersive spectroscopy; Sem micrographs showed that Ba 1-χ Sr χ TiO 3 thin films were uniform without cracks or pinholes. Additionally, the analysis of the X-ray diffraction results indicated the substitutional incorporation of Sr into the BaTiO 3 lattice and the obtainment of crystalline films for the entire range of the x values. (Author)

  18. Barium depletion study on impregnated cathodes and lifetime prediction

    International Nuclear Information System (INIS)

    Roquais, J.M.; Poret, F.; Doze, R. le; Ricaud, J.L.; Monterrin, A.; Steinbrunn, A.

    2003-01-01

    In the thermionic cathodes used in cathode ray-tubes (CRTs), barium is the key element for the electronic emission. In the case of the dispenser cathodes made of a porous tungsten pellet impregnated with Ba, Ca aluminates, the evaporation of Ba determines the cathode lifetime with respect to emission performance in the CRT. The Ba evaporation results in progressive depletion of the impregnating material inside the pellet. In the present work, the Ba depletion with time has been extensively characterized over a large range of cathode temperature. Calculations using the depletion data allowed modeling of the depletion as a function of key parameters. The link between measured depletion and emission in tubes has been established, from which an end-of-life criterion was deduced. Taking modeling into account, predicting accelerated life-tests were performed using high-density maximum emission current (MIK)

  19. Analytical study of electron flows with a virtual cathode

    International Nuclear Information System (INIS)

    Dubinov, A.E.

    2000-01-01

    The dynamics of the electron flow behavior by its injection into a half-space is considered. Two problems are considered, namely the long-term injection of a monoenergetic electron flow and instantaneous flow injection with an assigned electron energy spectrum. The all flow electrons in both cases return to the injection plane. The simple analytical self-consistent model of the initial stage of the virtual cathode formation in a plane-parallel equipotential gap is plotted in the course of analysis whereof the duration of the virtual cathode formation process is determined. The performance of this model is not limited by the multivalence of the electron velocity in the flow. This makes it possible to extend the frames of the model performance relative to the moment of the virtual cathode formation and to consider its dynamics. The frequency of electron oscillations in the potential cathode-virtual cathode well is determined on the basis of the above model [ru

  20. New doped tungsten cathodes. Applications to power grid tubes

    International Nuclear Information System (INIS)

    Cachard, J. de; Cadoret, K; Martinez, L.; Veillet, D.; Millot, F.

    2001-01-01

    Thermionic emission behavior of tungsten/tungsten carbide modified with rare earth (La, Ce, Y) oxides is examined on account of suitability to deliver important current densities in a thermo-emissive set up and for long lifetime. Work functions of potential cathodes have been determined from Richardson plots for La 2 O 3 doped tungsten and for tungsten covered with variable compositions rare earth tungstates. The role of platinum layers covering the cathode was also examined. Given all cathodes containing mainly lanthanum oxides were good emitters, emphasis was put on service lifetime. Comparisons of lifetime in tungsten doped with rare earth oxides and with rare earth tungstates show that microstructure of the operating cathodes may play the major role in the research of very long lifetime cathodes. Based on these results, tests still running show lifetime compatible with power grid tubes applications. (author)

  1. Focused cathode design to reduce anode heating during vircator operation

    Energy Technology Data Exchange (ETDEWEB)

    Lynn, Curtis F.; Dickens, James C.; Neuber, Andreas A. [Center for Pulsed Power and Power Electronics, Department of Electrical and Computer Engineering, Texas Tech University, Lubbock, Texas 79409 (United States)

    2013-10-15

    Virtual cathode oscillators, or vircators, are a type of high power microwave device which operates based on the instability of a virtual cathode, or cloud of electrons, which forms when electron current injected into the drift tube exceeds the space charge limited current within the drift tube. Anode heating by the electron beam during vircator operation ultimately limits achievable pulse lengths, repetition rates, and the duration of burst mode operation. This article discusses a novel cathode design that focuses electrons through holes in the anode, thus significantly reducing anode heating by the electrons emitted from the cathode during the first transit through the A-K gap. Reflexing electrons continue to deposit energy on the anode; however, the discussed minimization of anode heating by main beam electrons has the potential to enable higher repetition rates as well as efficiency and longer diode lifetime. A simulation study of this type of cathode design illustrates possible advantages.

  2. The effect of cathode surface impurities on gap closure

    International Nuclear Information System (INIS)

    Hinshelwood, D.D.

    1983-01-01

    Gap closure due to cathode (or anode) plasma motion is often the principal limitation on the pulse length of intense beam diodes and magnetically insulated transmission lines. Since the plasma expansion velocity is typically on the order of the sound speed, a high atomic number plasma is desirable. In recent experiments performed on a Sandia Nereus accelerator (240kV, 50kA, 3-30kA/cm 2 , 70ns) with a parallel plate diode, the cathode plasma was seen to be composed of both the cathode substrate material and constituents (hydrogen and carbon) of surface contaminants such as pump oils. The plasma expansion velocities, inferred from impedance measurements, were 1.5-2 cm/μs and were the same for carbon, aluminum and stainless steel cathodes. This similarity, combined with the temperature estimates of 2-3eV obtained from spectroscopy, implied that the expansion was due to protons from surface contaminants. Similar results were reported from studies of ablatively driven plasmas. In a continuation of the work, the results of time and spatially resolved spectroscopic studies of plasma formed on aluminum cathodes, yielding measurements of the expansion velocities of different components of the cathode plasma, are presented. We have heated stainless steel cathodes in situ to 700 0 C. The Hα line emission was seen to decrease by more than an order of magnitude (becoming lost in the background) when the cathodes were heated but no change in the impedance behavior was observed. Evidently the heating was insufficient to remove the last monolayer, which should contain more than enough hydrogen to close the gap. Preliminary experiments with gold-plated cathodes (which should be more resistant to chemisorption) yielded similar results. Further measurements of plasma formed on heated cathodes are presented

  3. Determination of electric field strength and kinetic temperature in the cathode fall region of a hollow cathode discharge

    Energy Technology Data Exchange (ETDEWEB)

    De la Rosa, M I; Perez, C; Gruetzmacher, K [Universidad de Valladolid, Facultad de Ciencias, 47071 Valladolid (Spain); Gonzalo, A B; Del Val, J A, E-mail: delarosa@opt.uva.e [Universidad de Salamanca, Escuela Politecnica Superior, 05003 Avila (Spain)

    2010-05-01

    In this work, we demonstrate the high potential of two-photon excitation of the 1S -2S transition of atomic hydrogen followed by optogalvanic detection, for measuring under identical experimental conditions, the kinetic temperature and the electric field strength in the cathode sheath region of a hollow cathode discharge. The first obtained results for both parameters are discussed in this paper.

  4. Geiger counters of gamma rays with a bismuth cathode; Compteurs de geiger a rayons gamma a cathode de bismuth

    Energy Technology Data Exchange (ETDEWEB)

    Meunier, R; Legrand, J P [Commissariat a l' Energie Atomique, Saclay(France). Centre d' Etudes Nucleaires

    1953-07-01

    Geiger Muller counters present a lake of efficiency of some per cent, for the {gamma} radiations. In the region 0,3 - 1 MeV, a substantial growth of their output can be obtained by a special construction of their cathode. In accordance with previous works, we constructed some counter of formed cathode by a pleated copper wire fencing covered of Bi by electrolysis. The successive modifications brought to a cylindrical conventional cathode in sheet metal of copper, that succeeds to this type of cathode, drive to an improvement of the output. (M.B.) [French] Les compteurs de Geiger Muller presentent une efficacite assez faible de l'ordre de quelques pour cent, pour les rayonnements {gamma}. Dans la region 0,3 - 1 MeV, un accroissement substantiel de leur rendement peut etre obtenu par une construction speciale de leur cathode. Conformement a des travaux anterieurs, nous avons construit des compteurs a cathode formee par un grillage de cuivre plisse recouvert de Bi par electrolyse. Les modifications successives apportees a une cathode conventionnelle cylindrique en tole de cuivre, qui aboutissent a ce type de cathode, conduisent a une amelioration du rendement. (M.B.)

  5. A one-dimensional model illustrating virtual-cathode formation in a novel coaxial virtual-cathode oscillator.

    CSIR Research Space (South Africa)

    Turner, GR

    2014-09-01

    Full Text Available A one-dimensional electrostatic sheet model of a coaxial geometry Virtual Cathode Oscillator (VCO) is presented. The cathode is centrally located and connects to a peripherally located plate electrode to form a resonant cavity, and is thus...

  6. Air humidity and water pressure effects on the performance of air-cathode microbial fuel cell cathodes

    KAUST Repository

    Ahn, Yongtae

    2014-02-01

    To better understand how air cathode performance is affected by air humidification, microbial fuel cells were operated under different humidity conditions or water pressure conditions. Maximum power density decreased from 1130 ± 30 mW m-2 with dry air to 980 ± 80 mW m -2 with water-saturated air. When the cathode was exposed to higher water pressures by placing the cathode in a horizontal position, with the cathode oriented so it was on the reactor bottom, power was reduced for both with dry (1030 ± 130 mW m-2) and water-saturated (390 ± 190 mW m-2) air. Decreased performance was partly due to water flooding of the catalyst, which would hinder oxygen diffusion to the catalyst. However, drying used cathodes did not improve performance in electrochemical tests. Soaking the cathode in a weak acid solution, but not deionized water, mostly restored performance (960 ± 60 mW m-2), suggesting that there was salt precipitation in the cathode that was enhanced by higher relative humidity or water pressure. These results showed that cathode performance could be adversely affected by both flooding and the subsequent salt precipitation, and therefore control of air humidity and water pressure may need to be considered for long-term MFC operation. © 2013 Elsevier B.V. All rights reserved.

  7. Ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

    Energy Technology Data Exchange (ETDEWEB)

    Lautenschläger, T. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Feder, R., E-mail: thomas.lautenschlaeger@iom-leipzig.de [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Neumann, H. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany); Rice, C.; Schubert, M. [Department of Electrical and Computer Engineering and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511 (United States); Bundesmann, C. [Leibniz-Institute of Surface Modification, 04318 Leipzig (Germany)

    2016-10-15

    Highlights: • Ion beam sputter deposition under systematic variation of process parameters. • Angular and energy distribution of secondary particles. • Interaction between incorporated and impinging process gas. • Measured data compared with simulations. - Abstract: In the present study, the influence of ion energy and geometrical parameters onto the angular and energy distribution of secondary particles for sputtering a Ti target with Ar ions is investigated. The angular distribution of the particle flux of the sputtered Ti atoms was determined by the collection method, i.e. by growing Ti films and measuring their thickness. The formal description of the particle flux can be realized by dividing it into an isotropic and an anisotropic part. The experimental data show that increasing the ion energy or decreasing the ion incidence angle lead to an increase of the isotropic part, which is in good agreement with basic sputtering theory. The energy distribution of the secondary ions was measured using an energy-selective mass spectrometer. The energy distribution of the sputtered target ions shows a maximum at an energy between 10 eV and 20 eV followed by a decay proportional to E{sup −n}, which is in principle in accordance with Thompson’s theory, followed by a high energetic tail. When the sum of incidence angle and emission angle is increased, the high-energetic tail expands to higher energies and an additional peak due to direct sputtering events may occur. In the case of backscattered primary Ar ions, a maximum at an energy between 5 eV and 10 eV appears and, depending on the scattering geometry, an additional broad peak at a higher energy due to direct scattering events is observed. The center energy of the additional structure shifts systematically to higher energies with decreasing scattering angle or increasing ion energy. The experimental results are compared to calculations based on simple elastic two-particle-interaction theory and to

  8. Deuterium sputtering of Li and Li-O films

    Science.gov (United States)

    Nelson, Andrew; Buzi, Luxherta; Kaita, Robert; Koel, Bruce

    2017-10-01

    Lithium wall coatings have been shown to enhance the operational plasma performance of many fusion devices, including NSTX and other tokamaks, by reducing the global wall recycling coefficient. However, pure lithium surfaces are extremely difficult to maintain in experimental fusion devices due to both inevitable oxidation and codeposition from sputtering of hot plasma facing components. Sputtering of thin lithium and lithium oxide films on a molybdenum target by energetic deuterium ion bombardment was studied in laboratory experiments conducted in a surface science apparatus. A Colutron ion source was used to produce a monoenergetic, mass-selected ion beam. Measurements were made under ultrahigh vacuum conditions as a function of surface temperature (90-520 K) using x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and temperature programmed desorption (TPD). Results are compared with computer simulations conducted on a temperature-dependent data-calibrated (TRIM) model.

  9. Molecular dynamic simulations of the sputtering of multilayer organic systems

    CERN Document Server

    Postawa, Z; Piaskowy, J; Krantzman, K; Winograd, N; Garrison, B J

    2003-01-01

    Sputtering of organic overlayers has been modeled using molecular dynamics computer simulations. The investigated systems are composed of benzene molecules condensed into one, two and three layers on an Ag left brace 1 1 1 right brace surface. The formed organic overlayers were bombarded with 4 keV Ar projectiles at normal incidence. The development of the collision cascade in the organic overlayer was investigated. The sputtering yield, mass, internal and kinetic energy distributions of ejected particles have been analyzed as a function of the thickness of the organic layer. The results show that all emission characteristics are sensitive to the variation of layer thickness. Although most of the ejected intact benzene molecules originate from the topmost layer, the emission of particles located initially in second and third layers is significant. The analysis indicates that the metallic substrate plays a dominant role in the ejection of intact organic molecules.

  10. Reactively sputtered TeOx optical recording media

    International Nuclear Information System (INIS)

    Di Giulio, M.; Manno, D.; Micocci, G.; Rella, R.; Rizzo, A.; Tepore, A.

    1987-01-01

    Telluriom suboxide (TeO x ) thin films have been obtained by R.F. reactive sputtering deposition by using a Te target and an Ar-O 2 gas mixture. This technique of preparation has been shown to be a valid method because it is possible to easily obtain films with desired characteristics by an appropriate selection of the deposition conditions. Different samples were prepared by changing both the R.F. power (80-300 Watt) and the oxygen concentration in the sputtering gas. The films were analyzed in order to study their optical characteristics and the morphology before and after heat treatment. In particular, transmissivity and reflectivity have been found to change markedly by thermal treatment and critical temperatures in the range 120-150 grades centigrade. This property makes these films suitable for optical recording with a low output power laser diode

  11. Dependence of plasma characteristics on dc magnetron sputter parameters

    International Nuclear Information System (INIS)

    Wu, S.Z.

    2005-01-01

    Plasma discharge characteristics of a dc magnetron system were measured by a single Langmuir probe at the center axis of the dual-side process chamber. Plasma potential, floating potential, electron and ion densities, and electron temperature were extracted with varying dc power and gas pressure during sputter deposition of a metal target; strong correlations were shown between these plasma parameters and the sputter parameters. The electron density was controlled mostly by secondary electron generation in constant power mode, while plasma potential reflects the confinement space variation due to change of discharge voltage. When discharge pressure was varied, plasma density increases with the increased amount of free stock molecules, while electron temperature inversely decreased, due to energy-loss collision events. In low-pressure discharges, the electron energy distribution function measurements show more distinctive bi-Maxwellian distribution, with the fast electron temperature gradually decreases with increased gas pressure

  12. Resonance ionization of sputtered atoms: Progress toward a quantitative technique

    International Nuclear Information System (INIS)

    Calaway, W.F.; Pellin, M.J.; Young, C.E.; Whitten, J.E.; Gruen, D.M.; Coon, S.R.; Texas Univ., Austin, TX; Wiens, R.C.; Burnett, D.S.; Stingeder, G.; Grasserbauer, M.

    1992-01-01

    The combination of RIMS and ion sputtering has been heralded as the ideal means of quantitatively probing the surface of a solid. While several laboratories have demonstrated the extreme sensitivity of combining RIMS with sputtering, less effort has been devoted to the question of accuracy. Using the SARISA instrument developed at Argonne National Laboratory, a number of well-characterized metallic samples have been analyzed. Results from these determinations have been compared with data obtained by several other analytical methods. One significant finding is that impurity measurements down to ppb levels in metal matrices can be made quantitative by employing polycrystalline metal foils as calibration standards. This discovery substantially reduces the effort required for quantitative analysis since a single standard can be used for determining concentrations spanning nine orders of magnitude

  13. Collision cascades and sputtering induced by larger cluster ions

    International Nuclear Information System (INIS)

    Sigmund, P.

    1988-01-01

    Recent experimental work on larger cluster impact on solid surfaces suggests large deviations from the standard case of additive sputter yields both in the nuclear and electronic stopping regime. The paper concentrates on elastic collision cascades. In addition to very pronounced spike effects, two phenomena are pointed out that are specific to cluster bombardment. Multiple hits of cluster atoms on one and the same target atom may result in recoil atoms that move faster than the maximum recoil speed for monomer bombardment at the same projectile speed. This effect is important when the atomic mass of a beam atom is less than that of a target atom, M 1 2 . In the opposite case, M 1 >> M 2 , collisions between beam particles may accelerate some beam particles and slow down others. Some consequences are mentioned. Remarks on the nuclear stopping power of larger clusters and on electronic sputtering by cluster bombardment conclude the paper. 38 refs., 2 figs

  14. Corrosion of thin, magnetron sputtered Nb_2O_5 films

    International Nuclear Information System (INIS)

    Pillis, Marina Fuser; Geribola, Guilherme Altomari; Scheidt, Guilherme; Gonçalves de Araújo, Edval; Lopes de Oliveira, Mara Cristina; Antunes, Renato Altobelli

    2016-01-01

    Highlights: • Niobium oxide based films were obtained by DC magnetron sputtering. • Different deposition times were tested. • The best corrosion resistance was obtained for the Nb_2O_5 film produced at 15′. • Film porosity determines the corrosion resistance. - Abstract: Niobium oxide based thin films were deposited on AISI 316 stainless steel substrates using reactive DC magnetron sputtering. Structure, composition and corrosion resistance of the niobium oxide films were studied. The corrosion behavior of the specimens was evaluated by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization. The concentration of niobium and oxygen in the films was obtained by Rutherford backscattering spectroscopy (RBS). The film structure was analyzed by X-ray diffractometry. The corrosion resistance of the substrate was improved by the Nb_2O_5 layers. The best protective performance was achieved for the deposition time of 15 min.

  15. Biopolymer nanostructures induced by plasma irradiation and metal sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Slepička, P., E-mail: petr.slepicka@vscht.cz [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Juřík, P. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Malinský, P.; Macková, A. [Nuclear Physics Institute, Academy of Sciences of the Czech Republic, Rez, Prague 25068 (Czech Republic); Faculty of Science, J.E. Purkyně University, Ústí nad Labem (Czech Republic); Kasálková, N. Slepičková; Švorčík, V. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)

    2014-08-01

    Modification based on polymer surface exposure to plasma treatment exhibits an easy and cheap technique for polymer surface nanostructuring. The influence of argon plasma treatment on biopolymer poly(L-lactide acid (PLLA) will be presented in this paper. The combination of Ar{sup +} ion irradiation, consequent sputter metallization (platinum) and thermal annealing of polymer surface will be summarized. The surface morphology was studied using atomic force microscopy. The Rutherford Backscattering Spectroscopy and X-ray Photoelectron Spectroscopy were used as analytical methods. The combination of plasma treatment with consequent thermal annealing and/or metal sputtering led to the change of surface morphology and its elemental ratio. The surface roughness and composition has been strongly influenced by the modification parameters and metal layer thickness. By plasma treatment of polymer surface combined with consequent annealing or metal deposition can be prepared materials applicable both in tissue engineering as cell carriers, but also in integrated circuit manufacturing.

  16. Ion-assisted sputter deposition of molybdenum--silicon multilayers

    International Nuclear Information System (INIS)

    Vernon, S.P.; Stearns, D.G.; Rosen, R.S.

    1993-01-01

    X-ray multilayer (ML) structures that are fabricated by the use of magnetron-sputter deposition exhibit a degradation in structural quality as the deposition pressure is increased. The observed change in morphology is attributed to a reduced mobility of surface adsorbed atoms, which inhibits the formation of smooth, continuous layers. The application of a negative substrate bias produces ion bombardment of the growing film surface by sputtering gas ions extracted from the plasma and permits direct control of the energy density supplied to the film surface during thin-film growth. The technique supplements the energy lost to thermalization in high-pressure deposition and permits the fabrication of high-quality ML structures at elevated processing pressures. A threefold improvement in the soft-x-ray normal-incidence reflectance at 130 A results for substrate bias voltages of the order of ∼-150 V for Mo--Si ML's deposited at 10-mTorr Ar

  17. Magnetic properties of sputtered Permalloy/molybdenum multilayers

    International Nuclear Information System (INIS)

    Romera, M.; Ciudad, D.; Maicas, M.; Aroca, C.; Ranchal, R.

    2011-01-01

    In this work, we report the magnetic properties of sputtered Permalloy (Py: Ni 80 Fe 20 )/molybdenum (Mo) multilayer thin films. We show that it is possible to maintain a low coercivity and a high permeability in thick sputtered Py films when reducing the out-of-plane component of the anisotropy by inserting thin film spacers of a non-magnetic material like Mo. For these kind of multilayers, we have found coercivities which are close to those for single layer films with no out-of-plane anisotropy. The coercivity is also dependent on the number of layers exhibiting a minimum value when each single Py layer has a thickness close to the transition thickness between Neel and Bloch domain walls.

  18. Modeling of metastable phase formation diagrams for sputtered thin films.

    Science.gov (United States)

    Chang, Keke; Music, Denis; To Baben, Moritz; Lange, Dennis; Bolvardi, Hamid; Schneider, Jochen M

    2016-01-01

    A method to model the metastable phase formation in the Cu-W system based on the critical surface diffusion distance has been developed. The driver for the formation of a second phase is the critical diffusion distance which is dependent on the solubility of W in Cu and on the solubility of Cu in W. Based on comparative theoretical and experimental data, we can describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation. Metastable phase formation diagrams for Cu-W and Cu-V thin films are predicted and validated by combinatorial magnetron sputtering experiments. The correlative experimental and theoretical research strategy adopted here enables us to efficiently describe the relationship between the solubilities and the critical diffusion distances in order to model the metastable phase formation during magnetron sputtering.

  19. Cationic fluorinated polymer binders for microbial fuel cell cathodes

    KAUST Repository

    Chen, Guang; Wei, Bin; Logan, Bruce E.; Hickner, Michael A.

    2012-01-01

    Fluorinated quaternary ammonium-containing polymers were used as catalyst binders in microbial fuel cell (MFC) cathodes. The performance of the cathodes was examined and compared to NAFION ® and other sulfonated aromatic cathode catalyst binders using linear sweep voltammetry (LSV), impedance spectroscopy, and performance tests in single chamber air-cathode MFCs. The cathodes with quaternary ammonium functionalized fluorinated poly(arylene ether) (Q-FPAE) binders showed similar current density and charge transfer resistance (R ct) to cathodes with NAFION ® binders. Cathodes containing either of these fluorinated binders exhibited better electrochemical responses than cathodes with sulfonated or quaternary ammonium-functionalized RADEL ® poly(sulfone) (S-Radel or Q-Radel) binders. After 19 cycles (19 d), the power densities of all the MFCs declined compared to the initial cycles due to biofouling at the cathode. MFC cathodes with fluorinated polymer binders (1445 mW m -2, Q-FPAE-1.4-H; 1397 mW m -2, Q-FPAE-1.4-Cl; 1277 mW m -2, NAFION ®; and 1256 mW m -2, Q-FPAE-1.0-Cl) had better performance than those with non-fluorinated polymer binders (880 mW m -2, S-Radel; 670 mW m -2, Q-Radel). There was a 15% increase in the power density using the Q-FPAE binder with a 40% higher ion exchange capacity (Q-FPAE-1.4-H compared to Q-FPAE-1.0-Cl) after 19 cycles of operation, but there was no effect on the power production due to counter ions in the binder (Cl -vs. HCO 3 -). The highest-performance cathodes (NAFION ® and Q-FPAE binders) had the lowest charge transfer resistances (R ct) in fresh and in fouled cathodes despite the presence of thick biofilms on the surface of the electrodes. These results show that fluorinated binders may decrease the penetration of the biofilm and associated biopolymers into the cathode structure, which helps to combat MFC performance loss over time. © 2012 The Royal Society of Chemistry.

  20. Obsidian hydration profiles measured by sputter-induced optical emission.

    Science.gov (United States)

    Tsong, I S; Houser, C A; Yusef, N A; Messier, R F; White, W B; Michels, J W

    1978-07-28

    The variation of concentrations of hydrogen, sodium, potassium, lithium, calcium, magnesium, silicon, and aluminum as a function of depth in the hydration layer of obsidian artifacts has been determined by sputter-induced optical emission. The surface hydration is accompanied by dealkalization, and there is a buildup of alkaline earths, calcium and magnesium in the outermost layers. These results have clarified the phenomena underlying the obsidian hydration dating technique.