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Sample records for cathode sputtering

  1. Magnetron sputtering cathode for low power density operation

    Directory of Open Access Journals (Sweden)

    T. Motomura

    2017-12-01

    Full Text Available A novel magnetron sputtering cathode with a magnetic mirror configuration is proposed, for low power density operation. The magnetic field profiles are simply constructed using two cylindrical permanent magnets positioned behind the disk-shaped sputtering target of 50 mm in diameter. The magnetic mirror configuration near the center and the outer edges of the target enables low power density operation up to 0.25 W/cm2 in the case of DC input power of 5 W. A sputtering rate of ∼0.2 nm/min was obtained under experimental conditions with target-substrate distance of 280 mm, Ar gas pressure of 0.1 Pa, and DC input power of 15 W.

  2. High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

    Science.gov (United States)

    Sproul, William D.; Rudnik, Paul J.; Graham, Michael E.; Rohde, Suzanne L.

    1990-01-01

    Attention is given to an opposed cathode sputtering system constructed with the ability to coat parts with a size up to 15 cm in diameter and 30 cm in length. Initial trials with this system revealed very low substrate bias currents. When the AlNiCo magnets in the two opposed cathodes were arranged in a mirrored configuration, the plasma density at the substrate was low, and the substrate bias current density was less than 1 mA/sq cm. If the magnets were arranged in a closed-field configuration where the field lines from one set of magnets were coupled with the other set, the substrate bias current density was as high as 5.7 mA/sq cm when NdFeB magnets were used. In the closed-field configuration, the substrate bias current density was related to the magnetic field strength between the two cathodes and to the sputtering pressure. Hard well-adhered TiN coatings were reactively sputtered in the opposed cathode system in the closed-field configuration, but the mirrored configuration produced films with poor adhesion because of etching problems and low plasma density at the substrate.

  3. Carbon dust formation in a cold plasma from cathode sputtering

    International Nuclear Information System (INIS)

    Arnas, C.; Mouberi, A.; Hassouni, K.; Michau, A.; Lombardi, G.; Bonnin, X.; Benedic, F.; Pegourie, B.

    2009-01-01

    Nanoparticles are produced in argon glow plasmas where carbon is introduced by sputtering of a graphite cathode. A scaling law of growth is reported on as a function of the discharge time. Two successive stages of growth of concomitant agglomeration and carbon deposition are observed, followed by a final stage of growth by carbon deposition. A model of formation of molecular precursors by coagulation of neutral clusters on the one hand and of neutral-negative clusters on the other hand is presented, based on formation enthalpy and cluster geometry.

  4. Carbon dust formation in a cold plasma from cathode sputtering

    Science.gov (United States)

    Arnas, C.; Mouberi, A.; Hassouni, K.; Michau, A.; Lombardi, G.; Bonnin, X.; Bénédic, F.; Pégourié, B.

    2009-06-01

    Nanoparticles are produced in argon glow plasmas where carbon is introduced by sputtering of a graphite cathode. A scaling law of growth is reported on as a function of the discharge time. Two successive stages of growth of concomitant agglomeration and carbon deposition are observed, followed by a final stage of growth by carbon deposition. A model of formation of molecular precursors by coagulation of neutral clusters on the one hand and of neutral-negative clusters on the other hand is presented, based on formation enthalpy and cluster geometry.

  5. Contribution to crystallographical and mechanical analysis of molybdenum coatings prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1989-07-01

    Molybdenum coatings with different compression stresses are obtained by magnetron cathode sputtering by varying negative voltage applied to the substrate during deposition. Stress evolution, crystal texture and argon content are studied [fr

  6. Magnetron sputtered zinc oxide nanorods as thickness-insensitive cathode interlayer for perovskite planar-heterojunction solar cells.

    Science.gov (United States)

    Liang, Lusheng; Huang, Zhifeng; Cai, Longhua; Chen, Weizhong; Wang, Baozeng; Chen, Kaiwu; Bai, Hua; Tian, Qingyong; Fan, Bin

    2014-12-10

    Suitable electrode interfacial layers are essential to the high performance of perovskite planar heterojunction solar cells. In this letter, we report magnetron sputtered zinc oxide (ZnO) film as the cathode interlayer for methylammonium lead iodide (CH3NH3PbI3) perovskite solar cell. Scanning electron microscopy and X-ray diffraction analysis demonstrate that the sputtered ZnO films consist of c-axis aligned nanorods. The solar cells based on this ZnO cathode interlayer showed high short circuit current and power conversion efficiency. Besides, the performance of the device is insensitive to the thickness of ZnO cathode interlayer. Considering the high reliability and maturity of sputtering technique both in lab and industry, we believe that the sputtered ZnO films are promising cathode interlayers for perovskite solar cells, especially in large-scale production.

  7. Contribution to mechanical and crystallographic analysis of molyledenum layers prepared by magnetron cathode sputtering

    International Nuclear Information System (INIS)

    Bosland, P.

    1988-01-01

    Molybdenum coatings presenting different compression stresses are elaborated by magnetron cathode sputtering by varying the negative voltage of the substrate during deposition. Stress evolution is accompanied by crystal texture evolution and argon content incorporated in the layers. Crystallite orientation is explained by a phenomenon similar to canalisation observed in ion implantation. In a same deposit each component presents its own deformations different from neighbouring components [fr

  8. Surface analysis by glow discharge spectrometry: cathode zone and sputtering yield

    International Nuclear Information System (INIS)

    Ohannessian, L.

    1986-01-01

    Applications of the glow discharge optical spectroscopy for surface analysis are numerous. Moreover, this method enables to get qualitative and semi-quantitative results which are already significant. However, we should improve our knowledge of the physical parameters involved in the glow discharge lamp mechanisms and learn to handle such phenomena. The problems can be divided into two categories: sputtering of the target under argon ions accelerated in the cathode dark space, and luminous emission of torn away species which reach the negative glow region. Our aim was to take stock of the present theoretical knowledge which can be applied to the specific self-maintained glow discharge plasma. Moreover, we tried to link together (often roughly) the basic discharge parameters, i.e. current intensity I, voltage of the lamp Vg, pressure of the gas p. Specially a comparison between theoretical and experimental results was established concerning the pure target sputtering yields. The contribution of the argon ions striking the cathode is estimated taking into account their energetic distribution. The role of the fast argon neutrals produced by charge exchange with the ions is important; we evaluated their energetic distribution and their contribution to sputtering. The total theoretical sputtering yield is inferred: the comparison with experimental results is presented. The role of the gas temperature is emphasized [fr

  9. Effect of sputtered lanthanum hexaboride film thickness on field emission from metallic knife edge cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Kirley, M. P.; Novakovic, B.; Sule, N.; Weber, M. J.; Knezevic, I.; Booske, J. H. [Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States)

    2012-03-15

    We report experiments and analysis of field emission from metallic knife-edge cathodes, which are sputter-coated with thin films of lanthanum hexaboride (LaB{sub 6}), a low-work function material. The emission current is found to depend sensitively on the thickness of the LaB{sub 6} layer. We find that films thinner than 10 nm greatly enhance the emitted current. However, cathodes coated with a thicker layer of LaB{sub 6} are observed to emit less current than the uncoated metallic cathode. This result is unexpected due to the higher work function of the bare metal cathode. We show, based on numerical calculation of the electrostatic potential throughout the structure, that the external (LaB{sub 6}/vacuum) barrier is reduced with respect to uncoated samples for both thin and thick coatings. However, this behavior is not exhibited at the internal (metal/LaB{sub 6}) barrier. In thinly coated samples, electrons tunnel efficiently through both the internal and external barrier, resulting in current enhancement with respect to the uncoated case. In contrast, the thick internal barrier in thickly coated samples suppresses current below the value for uncoated samples in spite of the lowered external barrier. We argue that this coating thickness variation stems from a relatively low (no higher than 10{sup 18} cm{sup -3}) free carrier density in the sputtered polycrystalline LaB{sub 6}.

  10. Study of some structural properties of hydrogenated amorphous silicon thin films prepared by radiofrequency cathodic sputtering

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Barhdadi, A.

    2001-08-01

    In this work, we have used the grazing X-rays reflectometry technique to characterise hydrogenated amorphous silicon thin films deposited by radio-frequency cathodic sputtering. Relfectometry measurements are taken immediately after films deposition as well as after having naturally oxidised their surfaces during a more or less prolonged stay in the ambient. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears when the stay in the ambient is so long. (author)

  11. On the non-linear nature of the variation, with intensity, of high energy cathode sputtering, and the variation of the latter with temperature (1960)

    International Nuclear Information System (INIS)

    Cassignol, C.; Ranc, G.

    1960-01-01

    A new cathode sputtering theory at high energy is presented which has been elaborated in taking in account the non-linearity of this phenomenon with the density of the impinging ions. This theory allows to predict the influence of target temperature on the rate of cathode sputtering. This influence is experimentally demonstrated. (author) [fr

  12. Structure and optical properties of CdS:O films by cathode sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Nakajima, Masahiro; Asaba, Ryo; Suzuki, Akinori; Wakita, Kazuki [Department of Electrical, Electronics and Computer Engineering, Chiba Institute of Technology, 2-17-1, Tsudanuma, Narashino, Chiba 275-0016 (Japan); Shim, Yong-Gu [Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531 (Japan); Khalilova, Kh.; Mamedov, Nazim; Bayramov, Ayaz; Huseynov, Emil [Institute of Physics, Azerbaijan National Academy of Science, H. Javid ave. 33, Baku 1143 (Azerbaijan)

    2015-06-15

    We have studied the structure and optical properties of CdS:O films deposited on SLG (soda lime glass) substrates by cathode sputtering in the atmosphere of oxygen/argon gases. According to X-ray diffraction (XRD) and confocal Raman scattering data, the films annealed in vacuum at temperatures above 300 C exhibited crystalline structure of CdS. On the other hand, XRD, confocal Raman scattering, AFM (atomic force microscopy) and TEM (transmission electron microscopy) data indicated amorphous structure nano-crystallization in CdS:O films annealed in vacuum at 400 C. For the films, the emissions located at 3.35 eV were evident from photoluminescence measurements. The origin of this energy gap is discussed by taking into account redistribution of electronic density of states in the amorphous phase and quantum-size effect. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  13. Study of the sputtered Cu atoms and Cu+ ions in a hollow cathode glow discharge using a hybrid model

    International Nuclear Information System (INIS)

    Baguer, N.; Bogaerts, A.

    2005-01-01

    The role of the Cu atoms sputtered from the cathode material in a cylindrical hollow cathode discharge (HCD) and the corresponding Cu + ions are studied with a self-consistent model based on the principle of Monte Carlo (MC) and fluid simulations. In order to obtain a more realistic view of the discharge processes, this model is coupled with other submodels, which describe the behavior of electrons, fast Ar atoms, Ar + ions, and Ar metastable atoms, also based on the principles of MC and fluid simulations. Typical results are, among others, the thermalization profile of the Cu atoms, the fast Cu atom, the thermal Cu atom and Cu + ion fluxes and densities, and the energy distribution of the Cu + ions. It was found that the contribution of the Ar + ions to the sputtering was the most significant, followed by the fast Ar atoms. At the cathode bottom, there was no net sputtered flux but a net amount of redeposition. Throughout the discharge volume, at all the conditions investigated, the largest concentration of Cu atoms was found in the lower half of the HCD, close to the bottom. Penning ionization was found the main ionization mechanism for the Cu atoms. The ionization degree of copper atoms was found to be in the same order as for the argon atoms (10 -4 )

  14. Fuel cell measurements with cathode catalysts of sputtered Pt3Y thin films.

    Science.gov (United States)

    Lindahl, Niklas; Eriksson, Björn; Grönbeck, Henrik; Wreland Lindström, Rakel; Lindbergh, Göran; Lagergren, Carina; Wickman, Björn

    2018-03-07

    Fuel cells are foreseen to have an important role in sustainable energy systems, provided that catalysts with higher activity and stability are developed. In this work, we deposit highly active sputtered thin films of platinum alloyed with yttrium (Pt3Y) on commercial gas diffusion layers and measure their performance in a proton exchange membrane fuel cell. After acid pretreatment, the alloy is found to have up to 2.5 times higher specific activity than pure platinum. The performance of Pt3Y is much higher than pure Pt, even if all of the alloying element was leached out from parts of the thin metal film on the porous support. This indicates that an even higher performance is expected if the structure of the Pt3Y catalyst or of the support could be further improved. The results show that platinum alloyed with rare earth metals can be used as highly active cathode catalyst material, and significantly reduce the amount of platinum needed, in real fuel cells. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  15. Specific power reduction of an ion source due to heating and cathode sputtering of electrodes

    International Nuclear Information System (INIS)

    Hamilton, G.U.; Semashko, N.N.

    The potentialities and limitations of the water-cooled ion-optical system of the ion source designed for continuous operation of the high-power neutral beam injector are determined. The following problems are analyzed: thermal expansion and deformation of electrodes, electrode sputtering as a result of bombardment, and heat transfer to turbulent flow of water

  16. Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

    International Nuclear Information System (INIS)

    Fischer, J.; Adelhelm, C.; Bergfeldt, T.; Chang, K.; Ziebert, C.; Leiste, H.; Stüber, M.; Ulrich, S.; Music, D.; Hallstedt, B.; Seifert, H.J.

    2013-01-01

    Today most commercially available lithium ion batteries are still based on the toxic and expensive LiCoO 2 as a standard cathode material. However, lithium manganese based cathode materials are cheaper and environmentally friendlier. In this work cubic-LiMn 2 O 4 spinel, monoclinic-Li 2 MnO 3 and orthorhombic-LiMnO 2 thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (LiMn 2 O 4 , LiMnO 2 ) in a pure argon discharge. The deposition parameters, namely target power and working gas pressure, were optimized in a combination with a post deposition heat treatment with respect to microstructure and electrochemical behavior. The chemical composition was determined using inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The films' crystal structure, phase evolution and morphology were investigated by X-ray diffraction, micro Raman spectroscopy and scanning electron microscopy. Due to the fact that these thin films consist of the pure active material without any impurities, such as binders or conductive additives like carbon black, they are particularly well suited for measurements of the intrinsic physical properties, which is essential for fundamental understanding. The electrochemical behavior of the cubic and the orthorhombic films was investigated by galvanostatic cycling in half cells against metallic lithium. The cubic spinel films exhibit a maximum specific capacity of ∼ 82 mAh/g, while a specific capacity of nearly 150 mAh/g can be reached for the orthorhombic counterparts. These films are promising candidates for future all solid state battery applications. - Highlights: ► Synthesis of 3 Li–Mn–O structures by one up-scalable thin film deposition method ► Formation of o-LiMnO 2 by r.f. magnetron sputtering in combination with post-annealing ► Discharge capacity with o-LiMnO 2 cathodes twice as high as for c-LiMn 2 O 4 ► Thin film deposition of m-Li 2 MnO 3 and

  17. Natural and gamma radiation-induced conduction of silica and metaphosphate glass layers deposed by radiofrequency cathode sputtering

    International Nuclear Information System (INIS)

    Serra, Andre

    1977-01-01

    We present a study of natural and 60 Co induced conductions in radiofrequency sputtering deposed layers. Capacimetry and electronic microscopy observations permit a knowledge of the physical characteristics, mainly: homogeneity and thickness of these layers. A study of the natural current permit to characterise electrically the deposited films, the electrode and bulk insulator effects. In induced conduction, the behaviour of currents as a function of dose rate is interpreted in terms of ROSE'S and FOWLER'S photoconductivity theories. Induced currents versus applied fields are observed and compared with these obtained in the case of dielectric liquids and glasses. (author) [fr

  18. Structural transformation of sputtered o-LiMnO2 thin-film cathodes induced by electrochemical cycling

    International Nuclear Information System (INIS)

    Fischer, J.; Chang, K.; Ye, J.; Ulrich, S.; Ziebert, C.; Music, D.; Hallstedt, B.; Seifert, H.J.

    2013-01-01

    Orthorhombic LiMnO 2 (o-LiMnO 2 ) thin films were produced by non-reactive r.f. magnetron sputtering in combination with thermal post-annealing. Oxide phase formation was investigated by X-ray diffraction and Raman spectroscopy. In order to assign the X-ray signals and estimate the grain size, a simulation of the diffraction pattern was performed and compared with experimental data. The density of the films was determined to be 3.39 g/cm 3 using X-ray reflectivity. Electrochemical characterization was carried out by galvanostatic cycling and cyclic voltammetry of Li/o-LiMnO 2 half cells. There are distinct redox reactions at approx. 3 V and 4 V, whereas the latter splits into multiple peaks. Using ab initio calculations and thermodynamic models, Gibbs energies of o-LiMnO 2 and c-LiMn 2 O 4 were determined. The relation between these energies explains the irreversible phase transformation that has been observed during the cycling of the Li/o-LiMnO 2 half cell. - Highlights: • Quantitative, thermodynamic modeling of the o-LiMnO 2 /c-LiMn 2 O 4 phase transformation • First CV-investigations on magnetron sputtered nanocrystalline o-LiMnO 2 thin films • Synthesis of o-LiMnO 2 planar model systems for protective coating and SEI development

  19. Epitaxial growth of high temperature superconductors by cathodic sputtering I: thin films of YBaCuO

    International Nuclear Information System (INIS)

    Navacerrada, M.A.; Sefrioui, Z.; Arias, D.; Varela, M.; Loos, G.; Leon, C.; Lucia, M.L.; Santamaria, J.; Sanchez-Quesada, F.

    1998-01-01

    High quality c-oriented YBa 2 Cu 3 O 7 -x thin films have been grown on SrTiO 3 (100)substrates by high pressure sputtering in pure oxygen atmosphere. Low angle X-ray diffraction and atomic force microscopy were performed on films less than 250 angstrom thick showing a plenitude better than one unit cell. Moreover, the structural characterization by means of X ray φ scans showed that growth is epitaxial. The critical temperature has been measured by different ways and was always in the range 89.5-90.5K. the resistance transition is sharper than 1K and the mutual inductance response always shows magnetic losses peaks narrower than 0.3K. Critical current densities are in excess of 10''''6 angstrom/cm''''2 at 77K. (Author) 8 refs

  20. Preparation and characterization of magnetic nanostructures based on FeCo / IrMn deposited by cathode sputtering

    International Nuclear Information System (INIS)

    Pereira, Saulo Milani

    2011-01-01

    Spintronic devices based in the transport of spin polarized current, spin's torque and other related phenomena represent big promises in the scenery of the technological miniaturization of current electronic devices. Magnetic materials of great technological relevance for different areas deal with, despite some exceptions, films and multilayered structures with high complexity. Advances on these fields require the control of those structures in atomic scale, in order to be able to tailor their physical properties. The purpose of this work is the preparation of multilayered structures by sputtering, as well the study of magnetic phenomena involved in this structures. The aim is to produce a spin valve. This is a multilayer structure composed of two ferromagnetic layers, separated by a non magnetic spacer. The magnetisation of one of the ferromagnetic layers is free to rotate under the effect of small external fields, whilst the magnetisation of the other ferromagnetic layer remains fixed by means exchange coupling to a antiferromagnetic layer. The structure is tailored to allow the small applied magnetic fields to switch the magnetisation of the ferromagnetic layers from antiparallel state to a parallel state resulting in the variation of the electrical resistivity of the structure (GMR effect). Optimization of deposition conditions was required to obtain structures with exchange bias coupling, and antiferromagnetic coupling through a non magnetic spacer. The correlation between the deposition conditions and the magnetic properties of the films was studied. The work presented in this dissertation has contributed to the characterisation of both magnetic thin films, which can be used on the production of magnetic sensors, and the new sputtering system assembled in the Applied Physics Laboratory of CDTN. (author)

  1. Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering

    International Nuclear Information System (INIS)

    Hans, M.; Baben, M. to; Music, D.; Ebenhöch, J.; Schneider, J. M.; Primetzhofer, D.; Kurapov, D.; Arndt, M.; Rudigier, H.

    2014-01-01

    Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the coatings was determined by means of elastic recoil detection analysis and energy dispersive X-ray spectroscopy. The effect of oxygen incorporation on the stress-free lattice parameters and Young's moduli of Ti-Al-O-N coatings was investigated by X-ray diffraction and nanoindentation, respectively. As nitrogen is substituted by oxygen, implications for the charge balance may be expected. A reduction in equilibrium volume with increasing O concentration is identified by X-ray diffraction and density functional theory calculations of Ti-Al-O-N supercells reveal the concomitant formation of metal vacancies. Hence, the oxygen incorporation-induced formation of metal vacancies enables charge balancing. Furthermore, nanoindentation experiments reveal a decrease in elastic modulus with increasing O concentration. Based on ab initio data, two causes can be identified for this: First, the metal vacancy-induced reduction in elasticity; and second, the formation of, compared to the corresponding metal nitride bonds, relatively weak Ti-O and Al-O bonds

  2. Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hans, M., E-mail: hans@mch.rwth-aachen.de; Baben, M. to; Music, D.; Ebenhöch, J.; Schneider, J. M. [Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Primetzhofer, D. [Department of Physics and Astronomy, Uppsala University, Lägerhyddsvägen 1, S-75120 Uppsala (Sweden); Kurapov, D.; Arndt, M.; Rudigier, H. [Oerlikon Balzers Coating AG, Iramali 18, LI-9496 Balzers, Principality of Liechtenstein (Liechtenstein)

    2014-09-07

    Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the coatings was determined by means of elastic recoil detection analysis and energy dispersive X-ray spectroscopy. The effect of oxygen incorporation on the stress-free lattice parameters and Young's moduli of Ti-Al-O-N coatings was investigated by X-ray diffraction and nanoindentation, respectively. As nitrogen is substituted by oxygen, implications for the charge balance may be expected. A reduction in equilibrium volume with increasing O concentration is identified by X-ray diffraction and density functional theory calculations of Ti-Al-O-N supercells reveal the concomitant formation of metal vacancies. Hence, the oxygen incorporation-induced formation of metal vacancies enables charge balancing. Furthermore, nanoindentation experiments reveal a decrease in elastic modulus with increasing O concentration. Based on ab initio data, two causes can be identified for this: First, the metal vacancy-induced reduction in elasticity; and second, the formation of, compared to the corresponding metal nitride bonds, relatively weak Ti-O and Al-O bonds.

  3. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation

    OpenAIRE

    Schroeder, Jeremy; Thomson, W.; Howard, B.; Schell, N.; Näslund, Lars-Åke; Rogström, Lina; Johansson-Jöesaar, Mats P.; Ghafoor, Naureen; Odén, Magnus; Nothnagel, E.; Shepard, A.; Greer, J.; Birch, Jens

    2015-01-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (greater than50 keV), high photon flux (greater than10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (less than1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation...

  4. Deposition of hematite Fe.sub.2./sub.O.sub.3./sub. thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

    Czech Academy of Sciences Publication Activity Database

    Hubička, Zdeněk; Kment, Štěpán; Olejníček, Jiří; Čada, Martin; Kubart, T.; Brunclíková, Michaela; Kšírová, Petra; Adámek, Petr; Remeš, Zdeněk

    2013-01-01

    Roč. 549, Dec (2013), s. 184-191 ISSN 0040-6090 R&D Projects: GA ČR GAP108/12/2104; GA MŠk LH12043 Grant - others:AVČR(CZ) M100101215 Institutional support: RVO:68378271 Keywords : HIPIMS * thin film s * hollow cathode Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.867, year: 2013

  5. Comparative study of structural and electro-optical properties of ZnO:Ga films grown by steered cathodic arc plasma evaporation and sputtering on plastic and their application on polymer-based organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Chih-Hao, E-mail: dataman888@hotmail.com [R& D Division, Walsin Technology Corporation, Kaohsiung, Taiwan (China); Hsiao, Yu-Jen [National Nano Device Laboratories, National Applied Research Laboratories, Tainan, Taiwan (China); Hwang, Weng-Sing [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China)

    2016-08-01

    Ga-doped ZnO (GZO) films with various thicknesses (105–490 nm) were deposited on PET substrates at a low temperature of 90 °C by a steered cathodic arc plasma evaporation (steered CAPE), and a GZO film with a thickness of 400 nm was deposited at 90 °C by a magnetron sputtering (MS) for comparison. The comparative analysis of the microstructure, residual stress, surface morphology, electrical and optical properties, chemical states, and doping efficiency of the films produced by the steered CAPE and MS processes was performed, and the effect of thickness on the CAPE-grown GZO films was investigated in detail. The results showed that the GZO films grown by steered CAPE exhibited higher crystallinity and lower internal stress than those deposited by MS. The transmittance and electrical properties were also enhanced for the steered CAPE-grown films. The figure of merit (Φ = T{sup 10}/R{sub s}, where T is the transmittance and R{sub s} is the sheet resistance in Ω/□). was used to evaluate the performance of the electro-optical properties. The GZO films with a thickness of 400 nm deposited by CAPE had the highest Φ value, 1.94 × 10{sup −2} Ω{sup −1}, a corresponding average visible transmittance of 88.8% and resistivity of 6.29 × 10{sup −4} Ω·cm. In contrast, the Φ value of MS-deposited GZO film with a thickness of 400 nm is only 1.1 × 10{sup −3} Ω{sup −1}. This can be attributed to the increase in crystalline size, [0001] preferred orientation, decrease in stacking faults density and Ar contamination in steered CAPE-grown films, leading to increases in the Hall mobility and carrier density. In addition, the power conversion efficiency (PCE) of organic solar cells was significantly improved by using the CAPE-grown GZO electrode, and the PCE values were 1.2% and 1.7% for the devices with MS-grown and CAPE-grown GZO electrodes, respectively. - Highlights: • ZnO:Ga (GZO) films were grown on PET by steered cathodic arc plasma evaporation (CAPE

  6. Dependence of the constitution, microstructure and electrochemical behaviour of magnetron sputtered Li-Ni-Mn-Co-O thin film cathodes for lithium-ion batteries on the working gas pressure and annealing conditions

    Energy Technology Data Exchange (ETDEWEB)

    Strafela, Marc; Fischer, Julian; Leiste, Harald; Rinke, Monika; Bergfeldt, Thomas; Seifert, Hans Juergen; Ulrich, Sven [Karlsruhe Institute of Technology (KIT), Karlsruhe (Germany). Inst. for Applied Materials (IAM); Music, Denis; Chang, Keke; Schneider, Jochen [RWTH Aachen Univ. (Germany). Materials Chemistry

    2017-11-15

    Li(Ni{sub 1/3}Mn{sub 1/3}Co{sub 1/3})O{sub 2} as a cathode material for lithium ion batteries shows good thermal stability, high reversible capacity (290 mAh g{sup -1}), good rate capability and better results in terms of environmental friendliness. In this paper thin film cathodes in the material system Li-Ni-Mn-Co-O were deposited onto silicon and stainless steel substrates, by non-reactive r.f. magnetron sputtering from a ceramic Li{sub 1.18}(Ni{sub 0.39}Mn{sub 0.19}Co{sub 0.35})O{sub 1.97} target at various argon working gas pressures between 0.2 Pa and 20 Pa. A comprehensive study on the composition and microstructure was carried out. The results showed that the elemental composition varies depending on argon working gas pressure. The elemental composition was determined by inductively coupled plasma optical emission spectroscopy in combination with carrier gas hot extraction. The films showed different grain orientations depending argon working gas pressures. The degree of cation order in the lattice structure of the films deposited at 0.5 Pa and 7 Pa argon working gas pressure, was increased by annealing in an argon/oxygen atmosphere at different pressures for one hour. The microstructure of the films varies with annealing gas pressure and is characterized using X-ray diffraction and unpolarized micro-Raman spectroscopy at room temperature. Electrochemical characterization of as-deposited and annealed films was carried out by galvanostatic cycling in Li-Ni-Mn-Co-O half-cells against metallic lithium. Correlations between process parameters, constitution, microstructure and electrochemical behaviour are discussed in detail.

  7. Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiation.

    Science.gov (United States)

    Schroeder, J L; Thomson, W; Howard, B; Schell, N; Näslund, L-Å; Rogström, L; Johansson-Jõesaar, M P; Ghafoor, N; Odén, M; Nothnagel, E; Shepard, A; Greer, J; Birch, J

    2015-09-01

    We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (>50 keV), high photon flux (>10(12) ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (<1 s) two-dimensional (2D) detector, permits time-resolved in situ structural analysis of thin film formation processes. The high-energy synchrotron-radiation based x-rays result in small scattering angles (<11°), allowing large areas of reciprocal space to be imaged with a 2D detector. The system has been designed for use on the 1-tonne, ultra-high load, high-resolution hexapod at the P07 High Energy Materials Science beamline at PETRA III at the Deutsches Elektronen-Synchrotron in Hamburg, Germany. The deposition system includes standard features of a typical UHV deposition system plus a range of special features suited for synchrotron radiation studies and industry-relevant processes. We openly encourage the materials research community to contact us for collaborative opportunities using this unique and versatile scientific instrument.

  8. Observation of the hollow cathode effect from a dielectric cathode

    Energy Technology Data Exchange (ETDEWEB)

    Hwang, Hyeon Seok; Oh, Jin Young; Baik, Hong Koo [Department of Advanced Materials Engineering, Yonsei University, Seoul 120-749 (Korea, Republic of); Kim, Youn Sang [Department of Nano Convergence, Graduate School of Convergence Science and Technology, Seoul National University, Suwon, 443-270 (Korea, Republic of); Lee, Se Jong [Department of Advanced Materials Engineering, Kyungsung University, Busan 608-736 (Korea, Republic of); Song, Kie Moon, E-mail: thinfilm@yonsei.ac.k [Department of Applied Physics, Konkuk University, Chungju-Si, 380-701 (Korea, Republic of)

    2010-12-15

    The hollow cathode effect (HCE) is investigated in the dielectric hollow cathode structure in a Ne-Xe mixture at 4%. The influence of the dielectric is shown experimentally by the relationship between voltage and current peaks. The linearity of reduced current density confirms the existence of the HCE and shows that cathode fall has the same value at every pD condition. Varying the pD, the variation in the discharge mode can be measured with IR intensity emitted from the plasma and photographs of discharge in the visible part of the spectra. Voltages and current in the range of 3 kV at 10 {mu}A were used. We suggest an electrode configuration reinforced in cathode sputtering for the display panel and light source using the dielectric hollow cathode discharge (DHCD), and introducing a mechanism of the DHCD mode.

  9. Observation of the hollow cathode effect from a dielectric cathode

    International Nuclear Information System (INIS)

    Hwang, Hyeon Seok; Oh, Jin Young; Baik, Hong Koo; Kim, Youn Sang; Lee, Se Jong; Song, Kie Moon

    2010-01-01

    The hollow cathode effect (HCE) is investigated in the dielectric hollow cathode structure in a Ne-Xe mixture at 4%. The influence of the dielectric is shown experimentally by the relationship between voltage and current peaks. The linearity of reduced current density confirms the existence of the HCE and shows that cathode fall has the same value at every pD condition. Varying the pD, the variation in the discharge mode can be measured with IR intensity emitted from the plasma and photographs of discharge in the visible part of the spectra. Voltages and current in the range of 3 kV at 10 μA were used. We suggest an electrode configuration reinforced in cathode sputtering for the display panel and light source using the dielectric hollow cathode discharge (DHCD), and introducing a mechanism of the DHCD mode.

  10. Novel matching lens and spherical ionizer for a cesium sputter ion ...

    Indian Academy of Sciences (India)

    The beam optics of a multi-sample sputter ion source, based on the NEC MCSNICS, has been modified to accommodate cathode voltages higher than 5 kV and dispenses with the nominal extractor. The cathode voltage in Cs sputter sources plays the role of the classical extractor accomplishing the acceleration of beam ...

  11. Barium-Dispenser Thermionic Cathode

    Science.gov (United States)

    Wintucky, Edwin G.; Green, M.; Feinleib, M.

    1989-01-01

    Improved reservoir cathode serves as intense source of electrons required for high-frequency and often high-output-power, linear-beam tubes, for which long operating lifetime important consideration. High emission-current densities obtained through use of emitting surface of relatively-low effective work function and narrow work-function distribution, consisting of coat of W/Os deposited by sputtering. Lower operating temperatures and enhanced electron emission consequently possible.

  12. Sputtering in a glow discharge ion source - pressure dependence: theory and experiment

    International Nuclear Information System (INIS)

    Mason, R.S.; Pichilingi, Melanie

    1994-01-01

    A simplified theoretical expression has been developed for a glow discharge to show how the average cathode erosion rate (expressed as the number of atoms per ion of the total bombarding flux) varies with primary sputter yield, pressure, 'diffusion length' and sputtered atom 'stopping' cross section. An inverse pressure dependence is predicted which correlates well with experiment in the 2 and He, tend to converge. It is suggested that this could be due to a change in the mechanism to self-sputtering. Under constant conditions, the erosion rates of different cathode materials still correlate quite well with the differences in their primary sputter yields. (author)

  13. Data compilation of angular distributions of sputtered atoms

    International Nuclear Information System (INIS)

    Yamamura, Yasunori; Takiguchi, Takashi; Tawara, Hiro.

    1990-01-01

    Sputtering on a surface is generally caused by the collision cascade developed near the surface. The process is in principle the same as that causing radiation damage in the bulk of solids. Sputtering has long been regarded as an undesirable dirty effect which destroys the cathodes and grids in gas discharge tubes or ion sources and contaminates plasma and the surrounding walls. However, sputtering is used today for many applications such as sputter ion sources, mass spectrometers and the deposition of thin films. Plasma contamination and the surface erosion of first walls due to sputtering are still the major problems in fusion research. The angular distribution of the particles sputtered from solid surfaces can possibly provide the detailed information on the collision cascade in the interior of targets. This report presents a compilation of the angular distribution of sputtered atoms at normal incidence and oblique incidence in the various combinations of incident ions and target atoms. The angular distribution of sputtered atoms from monatomic solids at normal incidence and oblique incidence, and the compilation of the data on the angular distribution of sputtered atoms are reported. (K.I.)

  14. Analysis of cathode geometry to minimize cathode erosion in direct current microplasma jet

    Energy Technology Data Exchange (ETDEWEB)

    Causa, Federica [Dipartimento di Scienze dell' Ambiente, della Sicurezza, del Territorio, degli Alimenti e della Salute, Universita degli studi di Messina, 98122 Messina (Italy); Ghezzi, Francesco; Caniello, Roberto; Grosso, Giovanni [Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Via R. Cozzi 53, 20125 Milano (Italy); Dellasega, David [Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Via R. Cozzi 53, 20125 Milano (Italy); Dipartimento di Energia, Politecnico di Milano, Via Ponzio 34/3, 20133 Milano (Italy)

    2012-12-15

    Microplasma jets are now widely used for deposition, etching, and materials processing. The present study focuses on the investigation of the influence of cathode geometry on deposition quality, for microplasma jet deposition systems in low vacuum. The interest here is understanding the influence of hydrogen on sputtering and/or evaporation of the electrodes. Samples obtained with two cathode geometries with tapered and rectangular cross-sections have been investigated experimentally by scanning electron microscopy and energy dispersion X-ray spectroscopy. Samples obtained with a tapered-geometry cathode present heavy contamination, demonstrating cathode erosion, while samples obtained with a rectangular-cross-section cathode are free from contamination. These experimental characteristics were explained by modelling results showing a larger radial component of the electric field at the cathode inner wall of the tapered cathode. As a result, ion acceleration is larger, explaining the observed cathode erosion in this case. Results from the present investigation also show that the ratio of radial to axial field components is larger for the rectangular geometry case, thus, qualitatively explaining the presence of micro-hollow cathode discharge over a wide range of currents observed in this case. In the light of the above findings, the rectangular cathode geometry is considered to be more effective to achieve cleaner deposition.

  15. Growth of cerium oxide thin layers for the manufacture of dosemeters and/or irradiation detectors by magnetron RF cathodic sputtering; Croissance de couches minces d'oxyde de cerium pour la realisation de dosimetres et/ou de detecteurs d'irradiation par pulverisation cathodique RF magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Ta, M.T.; Briand, D.; Guhel, Y.; Bernard, J.; Boudart, B. [Laboratoire Universitaire des Sciences Appliquees de Cherbourg (LUSAC), 50 - Cherbourg (France)

    2007-07-01

    Oxide thin films deposited on silicon substrate are interesting for the manufacture of dosemeters and detectors of gas, humidity, temperature and irradiation. The irradiation dose measurement is required for assessing the risks and advantages of the use of ionizing radiations in fields such as biology, medicine and more generally in all the civil and military nuclear applications. According to literature, cerium oxide seems to be potentially interesting for the manufacture of dosemeters and/or irradiation detectors. The influence of the deposition parameters, such as the inter-electrodes distance, the temperature, the RF power, the work pressure, on the crystalline quality of the CeO{sub 2} layers deposited on a silicon (111) substrate by magnetron RF cathodic sputtering has been studied. All these thin films have been characterized by X-ray diffraction and by Raman spectroscopy. At the present time, studies are carried out on 'flash' annealing in order to improve the crystalline state of the thin layers. The aim is to study the influence of gamma and neutrons irradiations on the electric properties of capacities made of CeO{sub 2} thin films. (O.M.)

  16. Vacuum arc on the polycrystalline silica cathode

    Directory of Open Access Journals (Sweden)

    D. V. Duhopel'nikov

    2014-01-01

    Full Text Available Thin films of silica and its compounds are used in modern technology to produce Li-ion batteries, wear-resistant and protective coatings, thin-films insulators, etc. This coating is produced with CVD methods, with magnetron sputtering systems or with electron-beam evaporation. The vacuum arc evaporation method, presently, is not used.The paper demonstrates a possibility for a long-term operation of vacuum arc evaporator with polycrystalline silica-aluminum alloy (90% of silica cathode and with magnetic system to create a variable form of arch-like magnetic field on the cathode surface. It was shown that archlike configuration of magnetic field provides a stable discharge and uniform cathode spots moving with the velocities up to 5 m/s with magnetic fields induction about 10 mT. Thus, there is no local melting of the cathode, and this provides its long-term work without chips, cracks and destruction. Cathodes spots move over the cathode surface leaving t big craters with melted edges on its surface. The craters size was 150-450μm. The cathode spot movement character and the craters on the cathode surface were like the spots movement, when working on the copper or aluminum cathodes. With the magnetic field induction less than 1 mT, the cathode spots movement was the same as that of on the silica mono-crystal without magnetic field. Thus, the discharge volt-ampere characteristics for different values of magnetic fields were obtained. Voltampere characteristics were increasing and were shifted to the higher voltage with increasing magnetic field. The voltage was 18.7-26.5 V for the arc current 30-140 A.So, it was confirmed that vacuum arc evaporation method could be used for effective evaporation of silica and silica-based alloys and for thin films deposition of this materials.

  17. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  18. Cathode degradation

    Energy Technology Data Exchange (ETDEWEB)

    Shores, D.A.; Selman, J.R.; Ong, E.T.

    1989-12-01

    This report describes the results of a three-year study of cathode degradation in molten carbonate fuel cells involving both experimental and theoretical work. A keystone of the study is the development of a mathematical model, which describes cathode degradation in terms of the fundamental processes of a fluxing mechanism, i.e., dissolution, transport and precipitation. New fundamental data have been obtained on the solubility of NiO, especially on the effect of water vapor, and on the kinetics of NiO dissolution in (Li{sub 0.62}K{sub 0.38}){sub 2}CO{sub 3}, and these data have been incorporated in the model. Laboratory cell testing in 3 cm{sup 2} cells has been carried out to obtain experimental data on degradation rates for direct comparison with the calculated results from the model. These comparisons have helped to verify several aspects of the model. For example, the model predicts with fair accuracy the location of the Ni deposit in the tile and the deposition rate. It is also fair to point out that the model is a relatively simple representation of complex processes, and it does not answer all questions about cathode degradation. Further work is needed. Because of its fundamental basis, the model can readily be upgraded and extended when further experimental data become available. The solubility studies, modeling efforts and cell testing have interacted iteratively to optimize progress. 94 figs., 24 tabs.

  19. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  20. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  1. Fundamentals of surfactant sputtering

    International Nuclear Information System (INIS)

    Hofsaess, Hans; Zhang Kun

    2009-01-01

    We introduce a new sputter technique, utilizing the steady-state coverage of a substrate surface with up to 10 16 cm -2 of foreign atoms simultaneously during sputter erosion by combined ion irradiation and atom deposition. These atoms strongly modify the substrate sputter yield on atomic to macroscopic length scales and therefore act as surfactant atoms (a blend of 'surface active agent'). Depending on the surfactant-substrate combination, the novel technique allows enhanced surface smoothing, generation of novel surface patterns, shaping of surfaces and formation of ultra-thin films. Sputter yield attenuation is demonstrated for sputtering of Si and Fe substrates and different surfactant species using 5 keV Xe ions at different incidence angles and fluences up to 10 17 cm -2 . Analytical approaches and Monte Carlo simulations are used to predict the sputtering yield attenuation as function of surfactant coverage. For sputtering of Si with Au surfactants we observe high sputter yields despite a steady-state surfactant coverage, which can be explained by strong ion-induced interdiffusion of substrate and surfactant atoms and the formation of a buried Au x Si surfactant layer in dynamic equilibrium.

  2. Characterization of Magnetron Sputtered Copper-Nickel Thin Film and Alloys

    Science.gov (United States)

    2016-09-01

    argon at.% atomic percent C carbon CH4 methane Cu copper EDX Energy-Dispersive X-ray Spectroscopy H2 hydrogen LPCVD Low Pressure Chemical Vapor...Sputtering uses ions from a gas discharge plasma in an electric field. The electric field accelerates the ions towards the target material, the cathode...not shown). A low Ar pressure setting of 3 mT produced the highest intensity peak and sputter rates for the Cu- and Ni-deposited films. However

  3. Nanotube cathodes.

    Energy Technology Data Exchange (ETDEWEB)

    Overmyer, Donald L.; Lockner, Thomas Ramsbeck; Siegal, Michael P.; Miller, Paul Albert

    2006-11-01

    Carbon nanotubes have shown promise for applications in many diverse areas of technology. In this report we describe our efforts to develop high-current cathodes from a variety of nanotubes deposited under a variety of conditions. Our goal was to develop a one-inch-diameter cathode capable of emitting 10 amperes of electron current for one second with an applied potential of 50 kV. This combination of current and pulse duration significantly exceeds previously reported nanotube-cathode performance. This project was planned for two years duration. In the first year, we tested the electron-emission characteristics of nanotube arrays fabricated under a variety of conditions. In the second year, we planned to select the best processing conditions, to fabricate larger cathode samples, and to test them on a high-power relativistic electron beam generator. In the first year, much effort was made to control nanotube arrays in terms of nanotube diameter and average spacing apart. When the project began, we believed that nanotubes approximately 10 nm in diameter would yield sufficient electron emission properties, based on the work of others in the field. Therefore, much of our focus was placed on measured field emission from such nanotubes grown on a variety of metallized surfaces and with varying average spacing between individual nanotubes. We easily reproduced the field emission properties typically measured by others from multi-wall carbon nanotube arrays. Interestingly, we did this without having the helpful vertical alignment to enhance emission; our nanotubes were randomly oriented. The good emission was most likely possible due to the improved crystallinity, and therefore, electrical conductivity, of our nanotubes compared to those in the literature. However, toward the end of the project, we learned that while these 10-nm-diameter CNTs had superior crystalline structure to the work of others studying field emission from multi-wall CNT arrays, these nanotubes still

  4. Nanotube cathodes

    International Nuclear Information System (INIS)

    Overmyer, Donald L.; Lockner, Thomas Ramsbeck; Siegal, Michael P.; Miller, Paul Albert

    2006-01-01

    Carbon nanotubes have shown promise for applications in many diverse areas of technology. In this report we describe our efforts to develop high-current cathodes from a variety of nanotubes deposited under a variety of conditions. Our goal was to develop a one-inch-diameter cathode capable of emitting 10 amperes of electron current for one second with an applied potential of 50 kV. This combination of current and pulse duration significantly exceeds previously reported nanotube-cathode performance. This project was planned for two years duration. In the first year, we tested the electron-emission characteristics of nanotube arrays fabricated under a variety of conditions. In the second year, we planned to select the best processing conditions, to fabricate larger cathode samples, and to test them on a high-power relativistic electron beam generator. In the first year, much effort was made to control nanotube arrays in terms of nanotube diameter and average spacing apart. When the project began, we believed that nanotubes approximately 10 nm in diameter would yield sufficient electron emission properties, based on the work of others in the field. Therefore, much of our focus was placed on measured field emission from such nanotubes grown on a variety of metallized surfaces and with varying average spacing between individual nanotubes. We easily reproduced the field emission properties typically measured by others from multi-wall carbon nanotube arrays. Interestingly, we did this without having the helpful vertical alignment to enhance emission; our nanotubes were randomly oriented. The good emission was most likely possible due to the improved crystallinity, and therefore, electrical conductivity, of our nanotubes compared to those in the literature. However, toward the end of the project, we learned that while these 10-nm-diameter CNTs had superior crystalline structure to the work of others studying field emission from multi-wall CNT arrays, these nanotubes still

  5. Cathodic protection -- Rectifier 46

    Energy Technology Data Exchange (ETDEWEB)

    Lane, W.M. [Westinghouse Hanford Co., Richland, WA (United States)

    1995-06-14

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system functions as required by project criteria. The cathodic protection system is for the tank farms on the Hanford Reservation. The tank farms store radioactive waste.

  6. Cathodic protection -- Rectifier 47

    Energy Technology Data Exchange (ETDEWEB)

    Lane, W.M. [Westinghouse Hanford Co., Richland, WA (United States)

    1995-06-14

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system functions as required by project criteria. The cathodic protection system is for the tank farms at the Hanford Reservation. The tank farms store radioactive waste.

  7. Cathodic protection -- Rectifier 47

    International Nuclear Information System (INIS)

    Lane, W.M.

    1995-01-01

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system functions as required by project criteria. The cathodic protection system is for the tank farms at the Hanford Reservation. The tank farms store radioactive waste

  8. Experimental study of the discharge in the low pressure plasma jet sputtering system

    Czech Academy of Sciences Publication Activity Database

    Klusoň, J.; Kudrna, P.; Kolpaková, A.; Picková, I.; Hubička, Zdeněk; Tichý, M.

    2013-01-01

    Roč. 53, č. 1 (2013), s. 10-15 ISSN 0863-1042 Institutional support: RVO:68378271 Keywords : hollow cathode * plasma jet sputtering system * Langmuir probe Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 0.983, year: 2013

  9. Magnetron sputtered gadolinia-doped ceria diffusion barriers for metal-supported solid oxide fuel cells

    DEFF Research Database (Denmark)

    Sønderby, Steffen; Klemensø, Trine; Christensen, Bjarke H.

    2014-01-01

    Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3 ...

  10. Proton sputtering. Final report

    International Nuclear Information System (INIS)

    Finfgeld, C.R.

    1975-01-01

    This research provides sputtering yields as a function of energy for H + and D + on several representative pure metallic elements, in the absence of surface contaminants. The experimental technique and apparatus are described. Data are given for Au, Co, Ta, W, and Mo

  11. Improvements in or relating to methods of and apparatus for coating wire, rod or strip material by sputtering

    International Nuclear Information System (INIS)

    Wareing, J.B.

    1976-01-01

    A method and apparatus are described for coating wire, rod or strip material comprising first subjecting the material to electron bombardment in a glow discharge to heat and activate the surface and then subjecting it to sputtering by use of a soft cathode discharge. The apparatus comprises a low pressure gas chamber through which the material is passed, and containing a glow discharge electron gun having a tubular cathode shaped so that the material can be passed axially through it, and an anode surrounding the cathode. The cathode is formed in two parts, the first part at one end, being made of material of low sputtering yield, and the second part being formed at least partially of the required coating material. The first part of the cathode may be of stainless steel or Al. The two parts of the cathode are electrically isolated with means provided for applying a lower negative potential, with respect to the anode, to the second part compared with the first part. The voltage applied to the second part may be controlled so as to control the sputtering rate. The gas pressure in the chamber is also controllable. The coating material may be arranged as inserts in the fixed cathode structure or as segments around the surface to be coated, and may be composed of Pb, Zn or Cu. (U.K.)

  12. Research and Development of a New Field Enhanced Low Temperature Thermionic Cathode that Enables Fluorescent Dimming and Loan Shedding without Auxiliary Cathode Heating

    Energy Technology Data Exchange (ETDEWEB)

    Feng Jin

    2009-01-07

    This is the final report for project entitled 'Research and development of a new field enhanced low temperature thermionic cathode that enables fluorescent dimming and load shedding without auxiliary cathode heating', under Agreement Number: DE-FC26-04NT-42329. Under this project, a highly efficient CNT based thermionic cathode was demonstrated. This cathode is capable of emitting electron at a current density two order of magnitude stronger then a typical fluorescent cathode at same temperatures, or capable of emitting at same current density but at temperature about 300 C lower than that of a fluorescent cathode. Detailed fabrication techniques were developed including CVD growth of CNTs and sputter deposition of oxide thin films on CNTs. These are mature technologies that have been widely used in industry for large scale materials processing and device fabrications, thus, with further development work, the techniques developed in this project can be scaled-up in manufacturing environment. The prototype cathodes developed in this project were tested in lighting plasma discharge environment. In many cases, they not only lit and sustain the plasma, but also out perform the fluorescent cathodes in key parameters such like cathode fall voltages. More work will be needed to further evaluate more detailed and longer term performance of the prototype cathode in lighting plasma.

  13. Cathodic Protection Model Facility

    Data.gov (United States)

    Federal Laboratory Consortium — FUNCTION: Performs Navy design and engineering of ship and submarine impressed current cathodic protection (ICCP) systems for underwater hull corrosion control and...

  14. Target surface condition during reactive glow discharge sputtering of copper

    International Nuclear Information System (INIS)

    Depla, D; Haemers, J; Gryse, R De

    2002-01-01

    During reactive glow discharge sputtering of copper in an argon/nitrogen plasma, we noticed an abrupt change of the target voltage and the deposition rate when the nitrogen concentration in the plasma exceeds a critical value. To explain this behaviour, the target surface after reactive glow discharge sputtering was examined by x-ray photoelectron spectroscopy (XPS). An experimental arrangement was constructed that allows direct transfer of the glow discharge cathode to the XPS analysis chamber without air exposure. These XPS measurements revealed that several different chemical states of nitrogen are present in the layer that forms on the target surface. The relative concentration of these different states changes when the critical nitrogen concentration in the plasma is exceeded

  15. Laser spectroscopy of sputtered atoms

    International Nuclear Information System (INIS)

    Gruen, D.M.; Pellin, M.J.; Young, C.E.; Calaway, W.F.

    1985-01-01

    The use of laser radiation to study the sputtering process is of relatively recent origin. Much has been learned from this work about the basic physics of the sputtering process itself through measurements of velocity and excited state distributions of sputtered atoms and the effects of adsorbates on substrate sputtering yields. Furthermore, the identification, characterization, and sensitive detection of sputtered atoms by laser spectroscopy has led to the development of in situ diagnostics for impurity fluxes in the plasma edge regions of tokamaks and of ultrasensitive methods (ppB Fe in Si) for surface analysis with ultralow (picocoulomb) ion fluences. The techniques involved in this work, laser fluorescence and multiphoton resonance ionization spectroscopy, will be described and illustrations given of results achieved up to now. 55 refs., 5 figs., 1 tab

  16. Production of intensive negative lithium beam with caesium sputter-type ion source

    Science.gov (United States)

    Lobanov, Nikolai R.

    2018-01-01

    Compounds of lithium oxide, hydroxide and carbonate, mixed with silver, were prepared for use as a cathode in caesium-sputter ion source. The intention was to determine the procedure which would produce the highest intensity negative lithium beams over extended period and with maximum stability. The chemical composition and properties of the samples were analysed using mass-spectrometry, optical microscopy, Scanning Electron Microscopy (SEM), Energy Dispersive X-ray Analyses (EDX) and Raman spectroscopy. These analyses showed that the chemical transformations with components resulted from pressing, storage and bake out were qualitatively in agreement with expectations. Intensive negative lithium ion beams >1 μA were delivered using cathodes fabricated from materials with multicomponent chemical composition when the following conditions were met: (i) use of components with moderate enthalpy of formation; (ii) low moisture content at final stage of cathode production and (iii) small concentration of water molecules in hydrate phase in the cathode mixture.

  17. Role of cathode identity in liquid chromatography particle beam glow discharge mass spectrometry

    Science.gov (United States)

    Krishna, M. V. Balarama; Marcus, R. K.

    2008-06-01

    A detailed evaluation of the role of cathode identity on the analytical and spectral characteristics of various organic, organometallic and metal analytes using liquid chromatography-particle beam/glow discharge mass spectrometry (LC-PB/GDMS) has been carried out. A d.c. discharge, operating with argon as the support gas, was used throughout this work. In this study, Cu which has a relatively high sputtering rate, Ni which has moderate sputtering rate and Ta which has very low sputtering rate, are taken as cathode materials to study the ionization, fragmentation, and analytical characteristics of organic (caffeine, epigallocatechin gallate, peptide as representative compounds), organometallic (selenomethionine, triethyl lead chloride as representative compounds) and metal (Fe, La, Cs and Pb) species. A range of discharge gas pressures (26.6-106.4 Pa) and currents (0.2-1.5 mA) were investigated with the test cathodes to determine their influence on the spectral composition and overall analytical response for the various test species. Calibration plots were obtained for all of the species for each of the three cathodes to determine the respective limits of detection. Relative detection limits in the range of 0.02 to 15 ng mL - 1 (0.002-1.5 ng, absolute) for the test species were found to be in the order of Cu > Ni > Ta; which follows the order of the sputtering characteristics of the respective cathodes. These studies rendered information about the respective discharge parameters' role in choosing the most appropriate cathode identity in PB-GDMS for application in the areas of organic, organometallic and inorganic species analysis.

  18. Improvements in ANIS and inverted sputter sources

    NARCIS (Netherlands)

    Zwol, N.A. van; Vermeer, A.; Strasters, B.A.

    1984-01-01

    In this article two sputter sources, i.e. an ANIS and an inverted sputter source are described. The ANIS has been changed into a SNICS-like configuration and measurements of the output current for different sputter target geometries are presented. In the inverted sputter source an immersion lens was

  19. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Czech Academy of Sciences Publication Activity Database

    Nietiadi, M.L.; Rosandi, Y.; Lorinčík, Jan; Urbassek, H.M.

    -, č. 303 (2013), s. 205-208 ISSN 0168-583X Institutional support: RVO:67985882 Keywords : Sputtering * Molecular dynamics * SIMS Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering Impact factor: 1.186, year: 2013

  20. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  1. Nanostructured sulfur cathodes

    KAUST Repository

    Yang, Yuan

    2013-01-01

    Rechargeable Li/S batteries have attracted significant attention lately due to their high specific energy and low cost. They are promising candidates for applications, including portable electronics, electric vehicles and grid-level energy storage. However, poor cycle life and low power capability are major technical obstacles. Various nanostructured sulfur cathodes have been developed to address these issues, as they provide greater resistance to pulverization, faster reaction kinetics and better trapping of soluble polysulfides. In this review, recent developments on nanostructured sulfur cathodes and mechanisms behind their operation are presented and discussed. Moreover, progress on novel characterization of sulfur cathodes is also summarized, as it has deepened the understanding of sulfur cathodes and will guide further rational design of sulfur electrodes. © 2013 The Royal Society of Chemistry.

  2. Onset of breakdown and formation of cathode spots

    International Nuclear Information System (INIS)

    Schwirzke, F.; Hallal, M.P. Jr.; Maruyama, X.K.

    1992-01-01

    The initial phase of onset of electrical breakdown in a vacuum discharge is characterized by very rapid ionization of surface material which leads to a kind of ''explosive'' plasma formation on electrodes. As an increasing electric field is applied between the two electrodes of vacuum diode the ionization process is initiated by field emission of electrons from highly localized spots on the cathode surface. Despite the fundamental importance of cathode spots for the breakdown process, the structure of cathode spots and the fast ionization rates of surface layers were riot fully understood. Besides joule heating of the field emitting spot, the electrons also desorb contaminants and ionize some of the released neutrals. Ions produced a short distance (∼ 1μm) from the spot are accelerated back towards the cathode. This ion bombardment leads to surface heating of the spot. Calculations of the power deposition show that ion surface heating is initially orders of magnitude larger than joule heating. Ion bombardment is especially important at low initial current densities since it leads efficiently to further desorption arid sputtering of neutrals from the surface and hence increases the neutral density which in turn increases the ionization rate. As more ions are produced, a positive space charge layer forms which enhances the electric field and thus strongly enhances the field emitted electron current. Surface heating and the build-up of positive space charge rapidly lead to further enhanced field emission and finally thermionic electron emission. The localized build-up plasma above the electron emitting spot naturally leads to pressure and electric field distributions which ignite unipolar arcs. The large electron current of the unipolar arc and large ion sputtering rates cause the ''explosion'' of surface material into the dense plasma of a cathode spot

  3. Improvements in ANIS and inverted sputter sources

    Science.gov (United States)

    Strasters, B. A.; Vermeer, A.; van Zwol, N. A.

    1984-02-01

    In this article two sputter sources, i.e. an ANIS and an inverted sputter source are described. The ANIS has been changed into a SNICS-like configuration and measurements of the output current for different sputter target geometries are presented. In the inverted sputter source an immersion lens was placed between the ionizer and the sputter target. This source is provided with a modified revolving target head with eight targets.

  4. In situ plasma sputtering and angular distribution measurements for structured molybdenum surfaces

    Science.gov (United States)

    Li, Gary Z.; Matlock, Taylor S.; Goebel, Dan M.; Dodson, Christopher A.; Matthes, Christopher S. R.; Ghoniem, Nasr M.; E Wirz, Richard

    2017-06-01

    We present in situ sputtering yield measurements of the time-dependent erosion of flat and micro-architectured molybdenum samples in a plasma environment. The measurements are performed using the plasma interactions (Pi) Facility at UCLA, which focuses a magnetized hollow cathode plasma to a material target with an exposure diameter of approximately 1.5 cm. During plasma exposure, a scanning quartz crystal microbalance (QCM) provides angular sputtering profiles that are integrated to estimate the total sputtering yield. This technique is validated to within the scatter of previous experimental data for a planar molybdenum target exposed to argon ion energies from 100 to 300 eV. The QCM is then used to obtain in situ measurements during a 17 h exposure of a micro-architectured-surface molybdenum sample to 300 eV incident argon ions. The time-dependent angular sputtering profile is shown to deviate from classical planar profiles, demonstrating the unique temporal and spatial sputtering effects of micro-architectured materials. Notably, the sputtering yield for the micro-architectured sample is initially much less than that for planar molybdenum, but then gradually asymptotes to the value for planar molybdenum after approximately 10 h as the surface features are eroded away.

  5. Ultra High Vacuum Sputtering System

    Science.gov (United States)

    1991-07-25

    NO. NO. Washington, D.C. 20332-6448 E.. 1,1. T IT LE (Incirot Securi ty Ciassificalion) (U L t ra High Vacuum Spattering System _1__ 12. PERSONAL...ABSTRACT (Continue on reuerse it necessary and identify by bioc, number) This grant provided for the purchase of an ultra high vacuum sputtering system, for...FOR GRANT FROM DEFENSE UNIVERSITY RESEARCH INSTRUMENTATION PROGRAM Grant no. AFOSR-89-0138 Date Submitted: 27 July, 1991 Title: Ultra High Vacuum Sputtering

  6. Preferential sputtering effects of carbides

    International Nuclear Information System (INIS)

    Taglauer, E.; Varga, P.

    1983-01-01

    Results from sputtering of TaC and TiC by various ions ranging from Xe + to H + are presented. Different effects of preferential sputtering show up in the surface concentration of TaC and TiC due to bombardment with various ions. For TaC mainly mass effects are important whereas binding energy and particularly chemical effects are found in TiC. (G.Q.)

  7. Observation of self-sputtering in energetic condensation of metal ions

    International Nuclear Information System (INIS)

    Anders, Andre

    2004-01-01

    The condensation of energetic metal ions on a surface may cause self-sputtering even in the absence of substrate bias. Charge-state-averaged self-sputtering yields were determined for both zirconium and gold ions generated by a cathodic vacuum arc. Films were deposited on differently biased substrates exposed to streaming Zr and Au vacuum arc plasma. The self-sputtering yields for both metals were estimated to be about 0.05 in the absence of bias, and exceeding 0.5 when bias reached-50 V. These surprisingly high values can be reconciled with binary collision theory and molecular dynamics calculations taking high the kinetic and potential energy of vacuum arc ions into account

  8. Development of mid-frequency AC reactive magnetron sputtering for fast deposition of Y2O3 buffer layers

    Science.gov (United States)

    Xiong, Jie; Xia, Yudong; Xue, Yan; Zhang, Fei; Guo, Pei; Zhao, Xiaohui; Tao, Bowan

    2014-02-01

    A reel-to-reel magnetron sputtering system with mid-frequency alternating current (AC) power supply was used to deposit double-sided Y2O3 seed layer on biaxially textured Ni-5 at.%W tape for YBa2Cu3O7-δ coated conductors. A reactive sputtering process was carried out using two opposite symmetrical sputtering guns with metallic yttrium targets and water vapor for oxidizing the sputtered metallic atoms. The voltage control mode of the power supply was used and the influence of the cathode voltage and ArH2 pressure were systematically investigated. Subsequently yttrium-stabilized zirconia (YSZ) barrier and CeO2 cap layers were deposited on the Y2O3 buffered substrates in sequence, indicating high quality and uniform double-sided structure and surface morphology of such the architecture.

  9. The use of hollow cathodes in deposition processes: A critical review

    Energy Technology Data Exchange (ETDEWEB)

    Muhl, Stephen, E-mail: muhl@unam.mx; Pérez, Argelia

    2015-03-31

    of electrons (we will call this a hollow cathode arc or HCA). The accepted explanation for the HCD phenomenon involves the existence of high-energy “pendulum” electrons, which are reflected from the sheaths on either side of the cathode; the long trajectory of this electron is understood to produce a large number of secondary electrons, with this resulting in the high plasma density and plasma current. We describe the structure of a parallel-plate discharge, particularly the gas phase and cathode surface excitation and ionization collision processes. Using this description, we discuss some of the problems associated with the conventional hollow cathode model and we propose a new explanation that has important implications for the physics and applications of hollow cathodes. In the last section of this review, we describe how hollow cathodes have and can be used to deposit thin films and nanostructured coatings. We provide an extensive and approximately chronological listing of how hollow cathodes have been successfully used to deposit materials, mainly by sputtering and plasma enhanced chemical vapour deposition based techniques. - Highlights: • We describe the discrepancies of the pendulum model of the hollow cathode plasma. • We present a model of the hollow cathode discharge based on doubly-charged ions. • The secondary electron yield of Ar{sup ++} from the cathode is about 4 times that of Ar{sup +}. • Plasma generation of Ar{sup ++} and the secondary electron emission are quasi-resonant. • A very high density hollow cathode discharge in pure hydrogen is not possible.

  10. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  11. A new design of the sputter type metal ion source and its characteristics of ion beam extraction

    International Nuclear Information System (INIS)

    Kim, W.; Choi, B.H.; Jin, J.T.; Jung, K.S.; Do, S.H.; Chung, K.H.

    1993-01-01

    In an attempt to get a high current metal ion beam of various solid elements including refractory metals, a gaseous duoPIGatron ion source was modified by placing a grid type cathode and a sputter target in the PIG chamber. Tungsten mesh was adopted as the cathode grid, and Ar gas was used for a support gas for sputter induction. For Cu, Fe, and Al, ion current and ratio of the metal ion were obtained at various conditions of sputtering voltage, support gas pressure, arc current, magnet current, and beam extraction voltage. Results showed that the metal current density is linearly changed with the sputtering voltage and magnet current. Ratio of the metal ion in the total current is larger at lower support gas pressure. Current densities for Al, Cu, and Fe were 4 mA/cm 2 , 5.5 mA/cm 2 , and 2 mA/cm 2 , respectively, at an arc current of 3 A, extraction voltage of 20 kV, and a sputtering voltage of 1 kV. Ratios of the metals in the extracted ion currents were 9%, 8%, and 5% for Al, Cu, and Fe, respectively

  12. Faraday screen sputtering on TPX

    International Nuclear Information System (INIS)

    Ehst, D.A.

    1994-12-01

    The TPX design stipulates that the ion-cyclotron resonance frequency (ICRF) antenna must have a Faraday screen (FS). The author considers here possible low Z coatings for the screen, as well as sputtering behavior of the Ni and Ti substrates. The theory of rf-induced sputtering has been developed, and he follows those theoretical approaches. The author's emphasis will be on both impurity generation as a possible source of increased Z eff , and also on actual erosion-lifetime of the materials under worst case conditions

  13. Modelling of process formation of the nanocomposite TiN-Cu layers received by vacuum-arc evaporation of Ti and magnetron sputtering of Cu

    Science.gov (United States)

    B-D Tsyrenov, D.; Semenov, A. P.; Smirnyagina, N. N.

    2017-05-01

    Modeling a TiN-Cu layers deposition process on a fused silica substrate under given conditions is carried out in this work. Calculation formulas which allow to determine the films thickness and their uniformity, with a substrate holder being located at an angle of 45 degrees to the normals of mutually perpendicular planes of the evaporated titanium cathode and the magnetron sputtering copper cathode, are given. The results of this work will be used to analyze the distribution velocity of the substance condensation flow and the character of the formed composite layers depending on the geometry of the cathode-substrate system.

  14. Characterization of Ag-doped vanadium oxide (AgxV2O5) thin film for cathode of thin film battery

    International Nuclear Information System (INIS)

    Hwang, H.S.; Oh, S.H.; Kim, H.S.; Cho, W.I.; Cho, B.W.; Lee, D.Y.

    2004-01-01

    The effect of silver co-sputtering on the characteristics of amorphous V 2 O 5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V 2 O 5 films. X-ray diffraction (XRD), Inductively coupled plasma-atomic emission spectrometry (ICP-AES), field emission-scanning electron microscopy (FE-SEM), Fourier transform infrared spectrometry (FT-IR) and X-ray photoelectron spectrometry (XPS) results indicate that the microstructure of the V 2 O 5 films is affected by the rf power of the co-sputtered silver. In addition, an all-solid-state thin film battery with full cell structure of Li/LiPON/Ag x V 2 O 5 /Pt has been fabricated. It is found that the silver co-sputtered V 2 O 5 cathode film exhibits better cycle performance than an undoped one

  15. Air cathode structure manufacture

    Science.gov (United States)

    Momyer, William R.; Littauer, Ernest L.

    1985-01-01

    An improved air cathode structure for use in primary batteries and the like. The cathode structure includes a matrix active layer, a current collector grid on one face of the matrix active layer, and a porous, nonelectrically conductive separator on the opposite face of the matrix active layer, the collector grid and separator being permanently bonded to the matrix active layer. The separator has a preselected porosity providing low IR losses and high resistance to air flow through the matrix active layer to maintain high bubble pressure during operation of the battery. In the illustrated embodiment, the separator was formed of porous polypropylene. A thin hydrophobic film is provided, in the preferred embodiment, on the current collecting metal grid.

  16. Sputtering technology in solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1978-01-01

    Potential and present sputtering technology is discussed as it applies to the deposition of solid film lubricants particularly MoS2, WS2, and PTFE. Since the sputtered films are very thin, the selection of the sputtering parameters and substrate condition is very critical as reflected by the lubricating properties. It was shown with sputtered MoS2 films that the lubricating characteristics are directly affected by the selected sputtering parameters (power density, pressure, sputter etching, dc-biasing, etc.) and the substrate temperature, chemistry, topography and the environmental conditions during the friction tests. Electron microscopy and other surface sensitive analytical techniques illustrate the resulting changes in sputtered MoS2 film morphology and chemistry which directly influence the film adherence and frictional properties.

  17. Optical characterisation of sputtered hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    Mellassi, K.; Chafik El Idrissi, M.; Chouiyakh, A.; Rjeb, A.; Barhdadi, A.

    2000-09-01

    The present work is devoted to the study of some optical properties of hydrogenated amorphous silicon (a-Si:H) thin films prepared by radio-frequency cathodic sputtering technique. It is essentially focused on investigating separately the effects of increasing partial hydrogen pressure during the deposition stage, and the effects of post deposition thermal annealing on the main optical parameters of the deposited layers (refraction index, optical gap Urbach energy, etc.). We show that low hydrogen pressures allow a saturation of the dangling bonds in the material, while high pressures lead to the creation of new defects. We also show that thermal annealing under moderate temperatures allows a good improvement of the structural quality of deposited films. (author)

  18. Depression cathode structure for cathode ray tubes having surface smoothness and method for producing same

    International Nuclear Information System (INIS)

    Rychlewski, T.V.

    1984-01-01

    Depression cathode structures for cathode ray tubes are produced by dispensing liquid cathode material into the depression of a metallic supporting substrate, removing excess cathode material by passing a doctor blade across the substrate surface and over the depression, and drying the cathode layer to a substantially immobile state. The cathode layer may optionally be further shaped prior to substantially complete drying thereof

  19. The Fabrication of Flow Field Plates for Direct Methanol Fuel Cell Using Lithography and Radio Frequency Sputtering.

    Science.gov (United States)

    Chang, Ho; Kao, Mu-Jung; Chen, Chih-Hao; Cho, Kun-Ching; Hsu, Chun-Yao; Chen, Zhi-Lun

    2015-08-01

    This study uses lithography to etch flow fields on a single side of a printed circuit board (PCB) and combines a flow field plate with a collector plate to make innovative anode flow field plates and cathode flow field plates for a direct methanol fuel cell (DMFC). TiO2 thin film is also sputtered on the anode flow field plate using radio frequency (RF) sputtering. The experimental results show that the prepared DMFC has a better maximum power density of 11.928 mW/cm2. Furthermore, when a TiO2 thin film is sputtered on the flow field plate of the assembled DMFC, the maximum power density is 14.426 mW/cm2, which is actually 21% more than that for a DMFC with no TiO2 thin film coated on the flow field plate.

  20. Geometrical Aspects of a Hollow-cathode Magnetron (HCM)

    International Nuclear Information System (INIS)

    Cohen, Samuel A.; Wang, Zhehui

    1998-01-01

    A hollow-cathode magnetron (HCM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS), is operable at substantially lower pressures than its planar-magnetron counterpart. We have studied the dependence of magnetron operational parameters on the inner diameter D and length L of a cylindrical HCS. Only when L is greater than L sub zero, a critical length, is the HCM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic or primary electron transport. At pressures above 1 mTorr, an electron-impact ionization model with Bohm diffusion at a temperature equivalent to one-half the primary electron energy and with an ambipolar constraint can explain the ion-electron pair creation required to sustain the discharge. The critical length L sub zero is determined by the magnetization length of the primary electrons

  1. Simulation experiments and solar wind sputtering

    International Nuclear Information System (INIS)

    Griffith, J.E.; Papanastassiou, D.A.; Russell, W.A.; Tombrello, T.A.; Weller, R.A.

    1978-01-01

    In order to isolate the role played by solar wind sputtering from other lunar surface phenomena a number of simulation experiments were performed, including isotope abundance measurements of Ca sputtered from terrestrial fluorite and plagioclase by 50-keV and 130-keV 14 N beams, measurement of the energy distribution of U atoms sputtered with 80-keV 40 Ar, and measurement of the fraction of sputtered U atoms which stick on the surfaces used to collect these atoms. 10 references

  2. Nanostructured lanthanum manganate composite cathode

    DEFF Research Database (Denmark)

    Wang, Wei Guo; Liu, Yi-Lin; Barfod, Rasmus

    2005-01-01

    that the (La1-xSrx)(y)MnO3 +/-delta (LSM) composite cathodes consist of a network of homogenously distributed LSM, yttria-stabilized zirconia (YSZ), and pores. The individual grain size of LSM or YSZ is approximately 100 nm. The degree of contact between cathode and electrolyte is 39% on average. (c) 2005...

  3. Zn Thin Film Deposition for Fe Layer Shielding Use the Sputtering Technique on Cylindrical Form

    International Nuclear Information System (INIS)

    Yunanto; Tjipto Sujitno, BA; Suprapto; Simbolon, Sahat

    2002-01-01

    Deposition of thin film on Fe substrate use sputtering technique on cylindrical form was carried out. The purpose of this research is to protect Fe due to the corrosion with Zn thin film. Sputtering method was proposed to protect a component of complex form. Substrate has functioned as anode, meanwhile target in cylindrical form as a cathode. Argon ion from anode bombard Zn with enough energy for releasing Zn. Zn atom would scatter and some of then was focused on the anode. For testing Zn atom on Fe by using XRF and corrosion rate with potentiostat. It was found that corrosion rate was decreased from 0.051 mpy to 0.031 mpy on 0.63 % of Fe substrate. (author)

  4. Microstructure of ZnO Thin Films Deposited by High Power Impulse Magnetron Sputtering (Postprint)

    Science.gov (United States)

    2015-03-01

    Avrutin, S. Cho , H. Morkoc, A comprehensive review of ZnO materials and devices, J. Appl. Phys. 98 (2005) 41301. [4] M. Shimizu, T. Shiosaki, A...cathodic vacuum arc, Thin Solid Films 398–399 (2001) 244. [11] C.F. Yu, C.W. Sung , S.H. Chen, S.J. Sun, Relationship between the photoluminescence...L. Sanghun, C. Dongkeun, K. Won-Jeong, H. Moon- Ho , L. Woong, Ga-doped ZnO films deposited with varying sputtering powers and substrate temperatures by

  5. Nitrogen dissociation during RF sputtering of Lipon electrolyte for all-solid-states batteries

    DEFF Research Database (Denmark)

    Stamate, Eugen; Christiansen, Ane Sælland; Holtappels, Peter

    2013-01-01

    Small size and high power density secondary batteries are desired for a large number of applications based on miniature wireless devices and sensors that need to be compatible with the microelectronic fabrication technology. This fact resulted in the development of solid electrolytes, like lithium...... phosphorus oxynitride (Lipon), that can be compacted with the anode and cathode electrodes in an all-solid-states structure where the nitrogen incorporation is considered one of the key parameters for controlling the ionic conductivity. In this work the nitrogen dissociation during RF sputtering of Lipon...

  6. Development of μ-PIC with resistive electrodes using sputtered carbon

    Science.gov (United States)

    Yamane, Fumiya; Ochi, Atsuhiko; Homma, Yasuhiro; Yamauchi, Satoru; Nagasaka, Noriko; Hasegawa, Hiroaki; Kawamoto, Tatsuo; Kataoka, Yosuke; Masubuchi, Tatsuya

    2018-02-01

    The Micro Pixel Chamber (μ-PIC) has been developed for a hadron-collider experiment. The main purpose is detecting Minimum Ionizing Particles (MIP) under high-rate Highly Ionizing Particles (HIP) environment. In such an environment, sufficient gain to detect MIP is needed, but continuous sparks will be caused by high-rate HIP. To reduce sparks, cathodes are made of resistive material. In this report, sputtered carbon was used as a new resistive cathode. Gas gain >104 was achieved using an 55Fe source. This value is sufficient to detect MIP without GEM or other floating structures. Also, thanks to production improvement, pixels are well aligned in the entire detection area.

  7. Novel magnetic controlled plasma sputtering method

    International Nuclear Information System (INIS)

    Axelevich, A.; Rabinovich, E.; Golan, G.

    1996-01-01

    A novel method to improve thin film vacuum sputtering is presented. This method is capable of controlling the sputtering plasma via an external set of magnets, in a similar fashion to the tetrode sputtering method. The main advantage of the Magnetic Controlled Plasma Sputtering (MCPS) is its ability to independently control all deposition parameters without any interference or cross-talk. Deposition rate, using the MCPS, is found to be almost twice the rate of triode and tetrode sputtering techniques. Experimental results using the MCPS to deposit Ni layers are described. It was demonstrated that using the MCPS method the ion beam intensity at the target is a result of the interaction of a homogeneous external magnetic field and the controlling magnetic fields. The MCPS method was therefore found to be beneficial for the production of pure stoichiometric thin solid films with high reproducibility. This method could be used for the production of compound thin films as well. (authors)

  8. Measurements of beryllium sputtering yields at JET

    Science.gov (United States)

    Jet-Efda Contributors Stamp, M. F.; Krieger, K.; Brezinsek, S.

    2011-08-01

    The lifetime of the beryllium first wall in ITER will depend on erosion and redeposition processes. The physical sputtering yields for beryllium (both deuterium on beryllium (Be) and Be on Be) are of crucial importance since they drive the erosion process. Literature values of experimental sputtering yields show an order of magnitude variation so predictive modelling of ITER wall lifetimes has large uncertainty. We have reviewed the old beryllium yield experiments on JET and used current beryllium atomic data to produce revised beryllium sputtering yields. These experimental measurements have been compared with a simple physical sputtering model based on TRIM.SP beryllium yield data. Fair agreement is seen for beryllium yields from a clean beryllium limiter. However the yield on a beryllium divertor tile (with C/Be co-deposits) shows poor agreement at low electron temperatures indicating that the effect of the higher sputtering threshold for beryllium carbide is important.

  9. Magnetron priming by multiple cathodes

    Science.gov (United States)

    Jones, M. C.; Neculaes, V. B.; Lau, Y. Y.; Gilgenbach, R. M.; White, W. M.; Hoff, B. W.; Jordan, N. M.

    2005-08-01

    A relativistic magnetron priming technique using multiple cathodes is simulated with a three-dimensional, fully electromagnetic, particle-in-cell code. This technique is based on electron emission from N /2 individual cathodes in an N-cavity magnetron to prime the π mode. In the case of the six-cavity relativistic magnetron, π-mode start-oscillation times are reduced up to a factor of 4, and mode competition is suppressed. Most significantly, the highest microwave field power is observed by utilizing three cathodes compared to other recently explored priming techniques.

  10. Boron ion beam generation utilizing lanthanum hexaboride cathodes: Comparison of vacuum arc and planar magnetron glow.

    Science.gov (United States)

    Nikolaev, A G; Oks, E M; Vizir, A V; Yushkov, G Yu; Frolova, V P

    2016-02-01

    Boron ion beams are widely used for semiconductor ion implantation and for surface modification for improving the operating parameters and increasing the lifetime of machine parts and tools. For the latter application, the purity requirements of boron ion beams are not as stringent as for semiconductor technology, and a composite cathode of lanthanum hexaboride may be suitable for the production of boron ions. We have explored the use of two different approaches to boron plasma production: vacuum arc and planar high power impulse magnetron in self-sputtering mode. For the arc discharge, the boron plasma is generated at cathode spots, whereas for the magnetron discharge, the main process is sputtering of cathode material. We present here the results of comparative test experiments for both kinds of discharge, aimed at determining the optimal discharge parameters for maximum yield of boron ions. For both discharges, the extracted ion beam current reaches hundreds of milliamps and the fraction of boron ions in the total extracted ion beam is as high as 80%.

  11. Implantation, recoil implantation, and sputtering

    International Nuclear Information System (INIS)

    Kelly, R.

    1984-01-01

    Underlying ion-beam modification of surfaces is the more basic subject of particle-surface interaction. The ideas can be grouped into forward and backward features, i.e. those affecting the interior of the target and those leading to particle expulsion. Forward effects include the stopping of the incident particles and the deposition of energy, both governed by integral equations which are easily set up but difficult to solve. Closely related is recoil implantation where emphasis is placed not on the stopping of the incident particles but on their interaction with target atoms with resulting implantation of these atoms. Backward effects, all of which are denoted as sputtering, are in general either of collisional, thermal, electronic, or exfoliational origin. (Auth.)

  12. Ion beam sputter implantation method

    International Nuclear Information System (INIS)

    King, W.J.

    1978-01-01

    By means of ion beam atomizing or sputtering an integrally composed coating, the composition of which continuously changes from 100% of the substrate to 100% of the coating, can be surfaced on a substrate (e.g. molten quartz on plastic lenses). In order to do this in the facility there is directed a primary beam of accelerated noble gas ions on a target from the group of the following materials: SiO 2 , Al 2 O 3 , Corning Glass 7070, Corning Glass 7740 or borosilicate glass. The particles leaving the target are directed on the substrate by means of an acceleration potential of up to 10 KV. There may, however, be coated also metal layers (Ni, Co) on a mylar film resulting in a semireflecting metal film. (RW) [de

  13. Sputtering measurements using a quartz crystal microbalance as a catcher

    Science.gov (United States)

    Berger, Bernhard M.; Szabo, Paul S.; Stadlmayr, Reinhard; Aumayr, Friedrich

    2017-09-01

    A quartz crystal microbalance (QCM) catcher setup for sputter yield measurements is described. In this setup a QCM is placed next to the sputter target and acts as a catcher for sputtered material. The sputter yield evaluation relies on assumptions about the angular distribution of sputtered particles and reflected primary projectiles taken from simulations as well as on the knowledge of the sticking coefficient. To test this new setup a second QCM with a Au layer was used as a sputter target. The measured ratio between target and catcher signal is well reproduced in the simulations demonstrating the feasibility of reconstructing the sputtering yield from the catcher signal.

  14. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.

    1992-01-01

    Vanadium oxide films have been prepared by RF-sputtering using an oxygen containing sputter ps and a V2O5 target. The main component of these films is orthorhombic V2O5 with poor crystallinity and a tendency for ordering of the crystallites with the c-direction parallel to the substrate. All films...... were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...

  15. Sensitivity and stability of sputtered sandwich photocells

    International Nuclear Information System (INIS)

    Murray, H.; Piel, A.

    1979-01-01

    The physical parameters of sputtered Metal-Semiconductor-Metal photocells are described in view of solar energy conversion. Specific properties of sputtered films lead to a particular stability of physical parameters such as dark conduction, capacitance and dielectric losses. Interband transitions occur when the photon energy is larger than the bandgap of the photoconductor. The transport of photo-excited carriers in the built-in electric field involves the existence of a photovoltaic effect. The influence of sputtering on the specific properties of solar energy conversion is discussed. (author)

  16. Chemical sputtering by impact of excited molecules

    International Nuclear Information System (INIS)

    Krstic, P.S.; Reinhold, C.O.; Stuart, S.J.

    2007-01-01

    We study chemical sputtering of deuterated amorphous carbon surfaces by D atoms, vibrationally excited D 2 , and dissociating D 3 molecules, in a range of impact energies, 7.5 - 30 eV/D. We analyze the role of the internal state, i.e. the vibrationally excited and dissociating states of the neutral molecules resulting from above-surface neutralization of impacting molecular ions in typical sputtering experiments. The sputtering yields are shown to considerably increase with the internal vibrational energy at the lowest impact energies. By comparison of calculated and measured yields we draw conclusions regarding the possible mechanisms for neutralization. (authors)

  17. Electrochromism of sputtered tungstic oxide films

    International Nuclear Information System (INIS)

    Tatsuoka, Hirokazu; Urabe, Kazuo; Kitao, Michihiko; Yamada, Shoji

    1985-01-01

    Electrochromism of tungstic oxide films were investigated. The films were prerared by r.f. sputtering from compressed WO 3 target under various total pressure and O 2 content of Ar-O 2 mixed sputtering atmosphere. Blue films were obtained under low total pressure of sputtering atmosphere with low content of O 2 . These films could be colored more deeply by the conventional electrochemical procedure, but could not be bleached to transparent states. Transparent films were obtained under the condition of high total pressure or high O 2 content of sputtering atmosphere. The transparent films prepared under high pressure show good electrochromic behavior after aging process. During the aging process, ''passive protons'' are injected into WO 3 matrix, where the ''passive proton'' means that it has no influence on electrochromic absorption band, and is not able to be extracted electrochemically. (author)

  18. Alkali metal adsorbate sputtering by molecular impact

    International Nuclear Information System (INIS)

    Moran, J.P.; Wachman, H.Y.; Trilling, L.

    1974-01-01

    An exploratory study of the sputtering by a krypton molecular beam of rubidium adsorbed at low coverage on a tungsten substrate has been described in a previous paper. An extension of this work is reported now

  19. Electrical resistivity of sputtered molybdenum films

    International Nuclear Information System (INIS)

    Nagano, J.

    1980-01-01

    The electrical resistivity of r.f. sputtered molybdenum films of thickness 5-150 nm deposited on oxidized silicon substrates was resolved into the three electron scattering components: isotropic background scattering, scattering at grain boundaries and scattering at surfaces. It was concluded that the isotropic background scattering is almost equal to that of bulk molybdenum and is not influenced by sputtering and annealing conditions. When the film thickness is sufficient that surface scattering can be ignored, the decrease in film resistivity after annealing is caused by the decrease in scattering at the grain boundaries for zero bias sputtered films, and is caused by an increase of the grain diameter for r.f. bias sputtered films. (Auth.)

  20. Sputtering yield measurements on single crystal cobalt

    International Nuclear Information System (INIS)

    Chernysh, V.S.; Johansen, A.; Sarholt-Kristensen, L.

    1981-01-01

    Single crystals of cobalt have been bombarded with 80 keV A + ions in the direction of the h.c.p. structure and in the direction of the f.c.c. structure. The sputtering yields, measured by the weight loss method, depend on the crystal structure, and damage, introduced by the ion bombardment, is shown to play a significant role in the explanation of the measured sputtering yields. (Auth.)

  1. Measurements of plasma parameters during Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. thin films deposition by double hollow cathode plasma jet system

    Czech Academy of Sciences Publication Activity Database

    Olejníček, Jiří; Hubička, Zdeněk; Virostko, Petr; Deyneka, Alexander; Jastrabík, Lubomír; Adámek, P.; Šícha, M.; Tichý, M.; Šíchová, H.

    2006-01-01

    Roč. 56, Suppl. B (2006), B1283-B1289 ISSN 0011-4626 Institutional research plan: CEZ:AV0Z10100522 Keywords : BSTO thin films * hollow cathode sputtering * Langmuir probe * emission spectroscopy Subject RIV: BH - Optics, Masers, Lasers Impact factor: 0.568, year: 2006

  2. FY1995 study to create the high density magnetic recording devices by using an ultra clean sputtering process; 1995 nendo choseijo sputter process ni yoru chokomitsudo jiki kiroku device no sosei

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-03-01

    It is important to control microstructure of thin film magnetic devices such as recording heads and media, in order to induce excellent magnetic properties. Since the impurities in the sputtering atmosphere is easily thought to affect strongly on the initial film growth, we will develop the highly purified sputtering atmosphere to establish a fabrication technology of ultra thin metallic films with desirable microstructure. A specialized multi-sputtering system which has extremely clean atmosphere (impurity level: 1/10000 compared to conventional systems) were realized by (a) decreasing out-gassing rate from vacuum chamber, pumping system, cathode, robot, etc. and (b) using ultra-clean processing gas. The base pressure was 8 x 10{sup -12} Torr (XHV) and the build-up rate was less than 1 x 10{sup -8} Torrl/sec. From the correlation between the microstructure and magnetic properties of a part of spin-valve GMR films, the guiding principle for the microstructural design were clarified to induce the exchange coupling effectively at the ferro/antiferromagnetic interface and to enhance the GMR effect at the magnetic/non-magnetic interface. The mechanism of' Cr segregation on the grain boundaries was clarified, in thin film media deposited under ultra clean sputtering process. The material specification of the magnetic ultra thin film media for high density recording with low media noise were designed from view of the thermal agitation. (NEDO)

  3. Advanced Cathode Electrolyzer (ACE), Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — The proposed innovation is a static, cathode-fed, 2000 psi, balanced-pressure Advanced Cathode Electrolyzer (ACE) based on PEM electrolysis technology. It...

  4. Reservoir Cathode for Electric Space Propulsion Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose a reservoir cathode to improve performance in both ion and Hall-effect thrusters. We propose to adapt our existing reservoir cathode technology to this...

  5. Highly Efficient Micro Cathode, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — Busek Company, Inc. proposes to develop a micro thermionic cathode that requires extremely low power and provides long lifetime. The basis for the cathode is a...

  6. Advanced Cathode Electrolyzer (ACE), Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — The proposed innovation is a static, cathode-fed, 2000 psi, balanced-pressure Advanced Cathode Electrolyzer (ACE) based on PEM electrolysis technology. It...

  7. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    Science.gov (United States)

    Vašina, P; Hytková, T; Eliáš, M

    2009-05-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  8. Mechanistic Enhancement of SOFC Cathode Durability

    Energy Technology Data Exchange (ETDEWEB)

    Wachsman, Eric [Univ. of Maryland, College Park, MD (United States)

    2016-02-01

    Durability of solid oxide fuel cells (SOFC) under “real world” conditions is an issue for commercial deployment. In particular cathode exposure to moisture, CO2, Cr vapor (from interconnects and BOP), and particulates results in long-term performance degradation issues. Here, we have conducted a multi-faceted fundamental investigation of the effect of these contaminants on cathode performance degradation mechanisms in order to establish cathode composition/structures and operational conditions to enhance cathode durability.

  9. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  10. Novel Cathodes Prepared by Impregnation Procedures

    Energy Technology Data Exchange (ETDEWEB)

    Eduardo Paz

    2006-09-30

    (1) We showed that similar results were obtained when using various LSM precursors to produce LSM-YSZ cathodes. (2) We showed that enhanced performance could be achieved by adding LSCo to LSMYSZ cathodes. (3) We have preliminary results showing that there is a slow deactivation with LSFYSZ cathodes.

  11. System of two-coordinate cylindrical proportional chambers with resistive cathode

    International Nuclear Information System (INIS)

    Golubev, V.B.; Peryshkin, A.N.; Red'ko, I.Yu.; Serednyakov, S.I.

    1981-01-01

    A system of two-coordinate cylindrical proportional chambers is developed for experiments on studying the e + e - annihilation. The system consists of 6 independent proportional chambers of semicylindrical configuration with a gap between anode and cathode equal to 5 mm. The diameter of an external chnsamber equals 25 cm and its length cotitutes 40 cm. Anode wires 20 μm in-diameter are fixed in parallel to the system axis with a pitch of 2-3 mm. The use of a resisti ve cothode permitting to maintain the anode wires and delay circuits under the ground potential is one of the specific feabures of the given chamber. The resistive layer is produced by sputtering the aquadag aqueous suspension with the polyvinylacetate emulsion on a fibregrass-textolite. 8 delay circuits is mounted outside of each chamber from the side of the cathode. A functional flowsheet of a data readout system is given. The track angte is determined directiy according to the numbers of operated wires; coordinates along the axis are determined by means of the delay circuits placed outside the chamber near the resistive cathode. The accuracy of the coordinate measurement in both directions constitutes about 1 mm. Each chamber permits to measure the coordinates of several particles, if they entry into different delay circuits. The proportional chambers are filled with the mixture of Ar+30%CO 2 . Anode and cathode efficiencies in the plateau region (150-250) exceed 99%

  12. Multi-sided metallization of textile fibres by using magnetron system with grounded cathode

    Directory of Open Access Journals (Sweden)

    Chodun Rafał

    2017-10-01

    Full Text Available The synthesis of coatings on textiles fibers enables functionalization of their properties e.g.: changing the reaction on IR radiation. In our experiment, a magnetron with a grounded cathode and positively biased anode was used as a source of plasma. A ring anode was positioned at 8 cm distance from the cathode. Samples of glass and cotton textile were placed at the plane of the anode. Ti and TiN coatings were deposited by sputtering of titanium target in Ar or Ar+ N2 atmosphere. SEM studies showed that, using the magnetron system described above, the textile fibers were covered by the 2 μm to 3 μm thick coatings. Unexpectedly, the coatings were deposited at both sides of the samples: the front side was exposed to glow discharge plasma and the backside was completely shaded from the plasma. IR optical investigation exhibited significant change in reflectance and transmittance of the coated textiles. The using of standard magnetron system (grounded anode and cathode at negative potential resulted in a coating deposition at the textile side exposed to the plasma action only. We believe that the multi-sided deposition of coatings observed during the process run with magnetron with grounded cathode is a result of an ambipolar diffusion mechanism in the anodic potential drop region.

  13. Sputtering properties of tungsten 'fuzzy' surfaces

    International Nuclear Information System (INIS)

    Nishijima, D.; Baldwin, M.J.; Doerner, R.P.; Yu, J.H.

    2011-01-01

    Sputtering yields of He-induced W 'fuzzy' surfaces bombarded by Ar have been measured in the linear divertor plasma simulator PISCES-B. It is found that the sputtering yield of a fuzzy surface, Y fuzzy , decreases with increasing fuzzy layer thickness, L, and saturates at ∼10% of that of a smooth surface, Y smooth , at L > 1 μm. The reduction in the sputtering yield is suspected to be due mainly to the porous structure of fuzz, since the ratio, Y fuzzy /Y smooth follows (1 - p fuzz ), where p fuzz is the fuzz porosity. Further, Y fuzzy /Y smooth is observed to increase with incident ion energy, E i . This may be explained by an energy dependent change in the angular distribution of sputtered W atoms, since at lower E i , the angular distribution is observed to become more butterfly-shaped. That is, a larger fraction of sputtered W atoms can line-of-sight deposit/stick onto neighboring fuzz nanostructures for lower E i butterfly distributions, resulting in lower ratio of Y fuzzy /Y smooth .

  14. Computer simulation of sputtering: A review

    International Nuclear Information System (INIS)

    Robinson, M.T.; Hou, M.

    1992-08-01

    In 1986, H. H. Andersen reviewed attempts to understand sputtering by computer simulation and identified several areas where further research was needed: potential energy functions for molecular dynamics (MD) modelling; the role of inelastic effects on sputtering, especially near the target surface; the modelling of surface binding in models based on the binary collision approximation (BCA); aspects of cluster emission in MD models; and angular distributions of sputtered particles. To these may be added kinetic energy distributions of sputtered particles and the relationships between MD and BCA models, as well as the development of intermediate models. Many of these topics are discussed. Recent advances in BCA modelling include the explicit evaluation of the time in strict BCA codes and the development of intermediate codes able to simulate certain many-particle problems realistically. Developments in MD modelling include the wide-spread use of many-body potentials in sputtering calculations, inclusion of realistic electron excitation and electron-phonon interactions, and several studies of cluster ion impacts on solid surfaces

  15. Physical sputtering of metallic systems by charged-particle impact

    Energy Technology Data Exchange (ETDEWEB)

    Lam, N.Q.

    1989-12-01

    The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs.

  16. Physical sputtering of metallic systems by charged-particle impact

    International Nuclear Information System (INIS)

    Lam, N.Q.

    1989-12-01

    The present paper provides a brief overview of our current understanding of physical sputtering by charged-particle impact, with the emphasis on sputtering of metals and alloys under bombardment with particles that produce knock-on collisions. Fundamental aspects of ion-solid interactions, and recent developments in the study of sputtering of elemental targets and preferential sputtering in multicomponent materials are reviewed. We concentrate only on a few specific topics of sputter emission, including the various properties of the sputtered flux and depth of origin, and on connections between sputtering and other radiation-induced and -enhanced phenomena that modify the near-surface composition of the target. The synergistic effects of these diverse processes in changing the composition of the integrated sputtered-atom flux is described in simple physical terms, using selected examples of recent important progress. 325 refs., 27 figs

  17. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimat......At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  18. Sputtering and mixing of supported nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física y Química Aplicadas a la Técnica Aeronaútica, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III (Electricidad y Electrónica), Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2013-12-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed.

  19. Quantitative sputter profiling at surfaces and interfaces

    International Nuclear Information System (INIS)

    Kirschner, J.; Etzkorn, H.W.

    1981-01-01

    The key problem in quantitative sputter profiling, that of a sliding depth scale has been solved by combined Auger/X-ray microanalysis. By means of this technique and for the model system Ge/Si (amorphous) the following questions are treated quantitatively: shape of the sputter profiles when sputtering through an interface and origin of their asymmetry; precise location of the interface plane on the depth profile; broadening effects due to limited depth of information and their correction; origin and amount of bombardment induced broadening for different primary ions and energies; depth dependence of the broadening, and basic limits to depth resolution. Comparisons are made to recent theoretical calculations based on recoil mixing in the collision cascade and very good agreement is found

  20. Sputtering as a means of depth profiling

    International Nuclear Information System (INIS)

    Whitton, J.L.

    1978-01-01

    Probably the most common technique for determination of depth profiles by sputtering is that of secondary ion mass spectrometry. Many problems occur in the important step of converting the time (of sputtering) scale to a depth scale and these problems arise before the secondary ions are ejected. An attempt is made to present a comprehensive list of the effects that should be taken into consideration in the use of sputtering as a means of depth profiling. The various parameters liable to affect the depth profile measurements are listed in four sections: beam conditions; target conditions; experimental environment; and beam-target interactions. The effects are discussed and where interplay occurs, cross-reference is made and examples are provided where possible. (B.R.H.)

  1. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson; Fatih Dogan; Vladimir Petrovsky

    2002-03-31

    This project has three main goals: Thin Films Studies, Preparation of Graded Porous Substrates and Basic Electrical Characterization and testing of Planar Single Cells. This period has continued to address the problem of making dense 1/2 to 5 {micro}m thick dense layers on porous substrates (the cathode LSM). Our current status is that we are making structures of 2-5 cm{sup 2} in area, which consist of either dense YSZ or CGO infiltrated into a 2-5 {micro}m thick 50% porous layer made of either nanoncrystalline CGO or YSZ powder. This composite structure coats a macroporous cathode or anode; which serves as the structural element of the bi-layer structure. These structures are being tested as SOFC elements. A number of structures have been evaluated both as symmetrical and as button cell configuration. Results of this testing indicates that the cathodes contribute the most to cell losses for temperatures below 750 C. In this investigation different cathode materials were studied using impedance spectroscopy of symmetric cells and IV characteristics of anode supported fuel cells. Cathode materials studied included La{sub 0.8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (LSCF), La{sub 0.7}Sr{sub 0.2}MnO{sub 3} (LSM), Pr{sub 0.8}Sr{sub 0.2}Fe{sub 0.8}O{sub 3} (PSCF), Sm{sub 0.8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (SSCF), and Yb{sub .8}Sr{sub 0.2}Co{sub 0.2}Fe{sub 0.8}O{sub 3} (SSCF). A new technique for filtering the Fourier transform of impedance data was used to increase the sensitivity of impedance analysis. By creating a filter specifically for impedance spectroscopy the resolution was increased. The filter was tailored to look for specific circuit elements like R//C, Warburg, or constant phase elements. As many as four peaks can be resolved using the filtering technique on symmetric cells. It may be possible to relate the different peaks to material parameters, like the oxygen exchange coefficient. The cathode grouped in order from lowest to highest ASR is

  2. Photonometers for coating and sputtering machines

    Science.gov (United States)

    Oupický, P.; Jareš, D.; Václavík, J.; Vápenka, D.

    2013-04-01

    The concept of photonometers (alternative name of optical monitor of a vacuum deposition process) for coating and sputtering machines is based on photonometers produced by companies like SATIS or HV Dresden. Photometers were developed in the TOPTEC centre and its predecessor VOD (Optical Development Workshop of Institut of Plasma Physics AS CR) for more than 10 years. The article describes current status of the technology and ideas which will be incorporated in next development steps. Hardware and software used on coating machines B63D, VNA600 and sputtering machine UPM810 is presented.

  3. Sputtering erosion of fusion reactor cavity walls

    International Nuclear Information System (INIS)

    Bohachevsky, I.O.; Hafer, J.F.

    1976-12-01

    Devised are functions that describe the empirically and theoretically determined behavior of sputtering coefficients. These functions are used in a computer program that calculates erosion rates and total erosion of surfaces bombarded by ion beams of specified intensity. Presented here are analytic expressions that describe the effects of ion energy and angle of incidence, computational procedures, and results. Results, computed for alpha, triton, deuteron, and heavy-metal ions bombarding niobium, carbon, and iron surfaces indicate that for pellets with heavy metal shell structures sputtering erosion should be carefully considered and properly designed for

  4. Dependence of sputtering coefficient on ion dose

    International Nuclear Information System (INIS)

    Colligon, J.S.; Patel, M.H.

    1977-01-01

    The sputtering coefficient of polycrystalline gold bombarded by 10-40 keV Ar + ions had been measured as a function of total ion dose and shown to exhibit oscillations in magnitude between 30 and 100%. Possible experimental errors which would give rise to such an oscillation have been considered, but it is apparent that these factors are unable to explain the measurements. It is proposed that a change in the Sublimation Energy associated with either bulk damage or formation of surface topographical features arising during ion bombardment may be responsible for the observed variations in sputtering coefficient. (author)

  5. Sputtering yield calculation for binary target

    International Nuclear Information System (INIS)

    Jimenez-Rodriguez, J.J.; Rodriguez-Vidal, M.; Valles-Abarca, J.A.

    1979-01-01

    The generalization for binary targets, of the ideas proposed by Sigmund for monoatomic targets, leads to a set of coupled intergrodifferential equations for the sputtering functions. After moment decomposition, the final formulae are obtained by the standard method based on the Laplace Transform, where the inverse transform is made with the aid of asymptotic expansions in the limit of very high projectile energy as compared to the surface binding energy. The possible loss of stoichiometry for binary targets is analyzed. Comparison of computed values of sputtering yield for normal incidence, with experimental results shows good agreement. (author)

  6. Sputtering target made by hot isostatic compaction

    International Nuclear Information System (INIS)

    Wright, R.J.; Hecht, R.J.; Fenton, R.J.

    1979-01-01

    In a method of making a cooled sputtering target assembly, material to be sputtered is in powder form which is isostatically hot-pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a dense material. Parts of the container are then removed from the target material except for a remnant around the outer surface of the target material. A cooling jacket is then fabricated and attached around the remnant of the container. The targets specified are made from MCrAlY type alloys where M is Fe, Co or Ni. (U.K.)

  7. Thick CrN/NbN multilayer coating deposited by cathodic arc technique

    Energy Technology Data Exchange (ETDEWEB)

    Araujo, Juliano Avelar; Tschiptschin, Andre Paulo; Souza, Roberto Martins, E-mail: antschip@usp.br [Universidade de Sao Paulo (USP), SP (Brazil); Lima, Nelson Batista de [Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil)

    2017-01-15

    The production of tribological nanoscale multilayer CrN/NbN coatings up to 6 μm thick by Sputtering/HIPIMS has been reported in literature. However, high demanding applications, such as internal combustion engine parts, need thicker coatings (>30 μm). The production of such parts by sputtering would be economically restrictive due to low deposition rates. In this work, nanoscale multilayer CrN/NbN coatings were produced in a high-deposition rate, industrial-size, Cathodic Arc Physical Vapor Deposition (ARC-PVD) chamber, containing three cathodes in alternate positions (Cr/ Nb/Cr). Four 30 μm thick NbN/CrN multilayer coatings with different periodicities (20, 10, 7.5 and 4 nm) were produced. The coatings were characterized by X-Ray Diffraction (XRD) and Transmission Electron Microscopy (TEM). The multilayer coating system was composed of alternate cubic rock salt CrN and NbN layers, coherently strained due to lattice mismatch. The film grew with columnar morphology through the entire stratified structure. The periodicities adopted were maintained throughout the entire coating. The 20 nm periodicity coating showed separate NbN and CrN peaks in the XRD patterns, while for the lower periodicity (≤10nm) coatings, just one intermediate lattice (d-spacing) was detected. An almost linear increase of hardness with decreasing bilayer period indicates that interfacial effects can dominate the hardening mechanisms. (author)

  8. Conical nano-structure arrays of Platinum cathode catalyst for enhanced cell performance in PEMFC (proton exchange membrane fuel cell)

    International Nuclear Information System (INIS)

    Khan, Aziz; Nath, Bhabesh Kumar; Chutia, Joyanti

    2015-01-01

    Conical nanostructure arrays of Pt (Platinum) as cathode catalyst are developed using a novel integrated plasma sputtering technique. The integration method involves successive deposition of Pt catalyst arrays one upon another maintaining a uniform time gap. Deposition by integrated approach results in the formation of dense arrays of Pt nanostructure as compared to continuous deposition. These high number density integrated arrays with low Pt loading of 0.10 mg cm −2 at the cathode provide enhanced performance compared to non-integrated cathode catalyst prepared by continuous deposition and standard commercial electrodes with Pt loadings of 1 mg cm −2 . The performance is compared on the basis of polarization curve measurements and the calculated power density values. PEM fuel cell with dual integrated cathode showed an improved power density of 0.90 W cm −2 , which is higher than continuously deposited cathode catalyst with maximum power density of 0.67 W cm −2 for the same Pt loading of 0.10 mg cm −2 . - Highlights: • Conical nanostructures with high number density are prepared by a novel integrated deposition technique. • Electrode with such catalyst shows maximum performance of 0.9 W cm −2 . • Integrated catalyst performs better than continuously prepared nanostructure catalyst.

  9. Aluminum oxide sputtering: a new approach to understanding the sputtering process for binary targets

    International Nuclear Information System (INIS)

    Finn, P.A.; Gruen, D.M.; Page, D.L.

    1976-01-01

    The relative abundances of the products Al, Al 2 O, and AlO sputtered in 15- and 40-kV Ar + and 15-kV H + bombardments of aluminum oxide targets (anodized film, polycrystalline disk, sapphire) are functions of the target material and of the nature, flux, and fluence of the ion beam. This finding suggests that, in collisional sputtering, the material's sensitive parameters are the surface binding energies of the sputtered species. These energies are functions of the surface composition present at the moment of a particular sputtering event and should be identified with the partial molar enthalpy of vaporization of a particular species. The aluminum oxide species--Al, Al 2 O, AlO, Al 2 O 2 , AlO 2 , Al(O 2 ) 2 , and AlO 3 --are characterized by matrix isolation spectroscopy aided by O 18 isotopic substitution experiments. 12 figures, 4 tables

  10. Synergistic sputtering properties of binary alloys

    International Nuclear Information System (INIS)

    Krauss, A.R.; DeWald, A.B.; Gruen, D.M.; Lam, N.Q.

    1984-01-01

    We have found that dilute concentrations of lithium in copper produce surfaces which are nearly pure lithium when heated and subject to irradiation. In order to better understand the experimental results, we have modeled the Cu-Li system using a modified version of the TRIM computer code and an alloy segregation program developed by N.Q. Lam. The TRIM code calculates the sputtering yield and depth of origin of the sputtered atoms for materials in which the composition varies from one atomic layer to the next and the segregation program uses these sputtering yields to trace the evolution of the concentration profile. The initial result of sputtering is to preferentially deplete the surface species. Continued irradiation, however, creates a subsurface region of high displacement damage. In the Cu-Li alloy, lithium moves very rapidly through this region, resulting in subsurface lithium enrichment. The enriched region broadens and eventually reaches the surface. The exact effect on the lithium concentration in the first two atomic layers depends on the temperature, damage profile, and particle flux. Results of the calculation are presented, along with a discussion of their implications for fusion reactor materials

  11. Morphology of ion-sputtered surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@baton.phys.lsu.edu; Cuerno, Rodolfo; Barabasi, Albert-Laszlo

    2002-12-01

    We derive a stochastic nonlinear continuum equation to describe the morphological evolution of amorphous surfaces eroded by ion bombardment. Starting from Sigmund's theory of sputter erosion, we calculate the coefficients appearing in the continuum equation in terms of the physical parameters characterizing the sputtering process. We analyze the morphological features predicted by the continuum theory, comparing them with the experimentally reported morphologies. We show that for short time scales, where the effect of nonlinear terms is negligible, the continuum theory predicts ripple formation. We demonstrate that in addition to relaxation by thermal surface diffusion, the sputtering process can also contribute to the smoothing mechanisms shaping the surface morphology. We explicitly calculate an effective surface diffusion constant characterizing this smoothing effect and show that it is responsible for the low temperature ripple formation observed in various experiments. At long time scales the nonlinear terms dominate the evolution of the surface morphology. The nonlinear terms lead to the stabilization of the ripple wavelength and we show that, depending on the experimental parameters, such as angle of incidence and ion energy, different morphologies can be observed: asymptotically, sputter eroded surfaces could undergo kinetic roughening, or can display novel ordered structures with rotated ripples. Finally, we discuss in detail the existing experimental support for the proposed theory and uncover novel features of the surface morphology and evolution, that could be directly tested experimentally.

  12. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...

  13. Pulsed dc self-sustained magnetron sputtering

    International Nuclear Information System (INIS)

    Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.

    2008-01-01

    The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition

  14. Effect of surface morphology on the sputtering yields. I. Ion sputtering from self-affine surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@usc.edu; Barabasi, Albert-Laszlo E-mail: alb@nd.edu

    2004-08-01

    As extensive experimental studies have shown, under certain conditions, ion bombardment of solid targets induces a random (self-affine) morphology on the ion-eroded surfaces. The rough morphology development is known to cause substantial variations in the sputtering yields. In this article, we present a theoretical model describing the sputter yields from random, self-affine surfaces subject to energetic ion bombardment. We employ the Sigmund's theory of ion sputtering, modified for the case of self-affine surfaces, to compute the sputter yields. We find that the changes in the sputtering yield, associated with the non-planar surface morphology, are strongly dependent on the parameters characterizing the surface roughness (such as the saturation width and the correlation length) and the incident ion beam (such as the incident ion energy and the deposited energy widths). It is shown that, for certain ranges of the parameters variations, surface roughness leads to substantial enhancements in the yield, with magnitude of the effect being more than 100%, as compared to the flat surface value. Furthermore, we find that, depending on the interplay between these parameters, the surface roughness can both enhance and suppress the sputter yields.

  15. Effect of surface morphology on the sputtering yields. II. Ion sputtering from rippled surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Makeev, Maxim A. E-mail: makeev@usc.edu; Barabasi, Albert-Laszlo E-mail: alb@nd.edu

    2004-08-01

    Off-normal ion bombardment of solid targets with energetic particles often leads to development of periodically modulated structures on the surfaces of eroded materials. Ion-induced surface roughening, in its turn, causes sputtering yield changes. We report on a comprehensive theoretical study of the effect of rippled surface morphology on the sputtering yields. The yield is computed as a function of the parameters characterizing the surface morphology and the incident ion beam, using the Sigmund's theory of ion sputtering. We find that the surface morphology development may cause substantial variations in the sputter yields, depending on a complex interplay between the parameters characterizing the ripple structure and the incident ion beam. For certain realizations of the ripple structure, the surface morphology is found to induce enhanced, relative to the flat surface value, sputtering yields. On the other hand, there exist regimes in which the sputtering yield is suppressed by the surface roughness below the flat surface result. We confront the obtained theoretical results with available experimental data and find that our model provides an excellent qualitative and, in some cases, quantitative agreement with the results of experimental studies.

  16. Reflective article having a sacrificial cathodic layer

    Science.gov (United States)

    Kabagambe, Benjamin; Buchanan, Michael J.; Scott, Matthew S.; Rearick, Brian K.; Medwick, Paul A.; McCamy, James W.

    2017-09-12

    The present invention relates to reflective articles, such as solar mirrors, that include a sacrificial cathodic layer. The reflective article, more particularly includes a substrate, such as glass, having a multi-layered coating thereon that includes a lead-free sacrificial cathodic layer. The sacrificial cathodic layer includes at least one transition metal, such as a particulate transition metal, which can be in the form of flakes (e.g., zinc flakes). The sacrificial cathodic layer can include an inorganic matrix formed from one or more organo-titanates. Alternatively, the sacrificial cathodic layer can include an organic polymer matrix (e.g., a crosslinked organic polymer matrix formed from an organic polymer and an aminoplast crosslinking agent). The reflective article also includes an outer organic polymer coating, that can be electrodeposited over the sacrificial cathodic layer.

  17. Electron beam generation form a superemissive cathode

    International Nuclear Information System (INIS)

    Hsu, T.-Y.; Liou, R.-L.; Kirkman-Amemiya, G.; Gundersen, M.A.

    1991-01-01

    An experimental study of electron beams produced by a superemissive cathode in the Back-Lighted Thyratron (BLT) and the pseudospark is presented. This work is motivated by experiments demonstrating very high current densities (≥10 kA/cm 2 over an area of 1 cm 2 ) from the pseudospark and BLT cathode. This high-density current is produced by field-enhanced thermionic emission from the ion beam-heated surface of a molybdenum cathode. This work reports the use of this cathode as a beam source, and is to be distinguished from previous work reporting hollow cathode-produced electron beams. An electron beam of more than 260 A Peak current has been produced with 15 kV applied voltage. An efficiency of ∼10% is estimated. These experimental results encourage further investigation of the super-emissive cathode as an intense electron beam source for applications including accelerator technology

  18. Sputtering of the 1020 AISI steel in abnormal glow discharge

    Science.gov (United States)

    García Zúñiga, J. A.; Sarmiento Santos, A.; Álvarez Luna, B.

    2017-12-01

    In all material treated in Sbnormal Glow Discharge (AGD) the phenomenon of sputtering occurs. In this work we study the sputtering suffered at different temperatures by AISI 1020 steel subjected to a DC discharge in two types of atmospheres. The steel samples were previously sanded until obtaining mirror brightness and subjected to the AGD plasma in the gaseous atmospheres of H2 and Ar. The temperature for each sputtering process was set in the range of 420°C to 600°C. In these samples the mass variation was measured and the yield sputtering processes was determined. Next, the simulation of the sputtering process was performed in the SRIM/TRIM 2008 software, by adjusting sputtering yield computational computations to those experimentally measured, in order to determine the energy with which the responsible ions of the sputtering collide with studied target.

  19. Progress of an end extraction sputtering PIG ion source with permanent magnet

    International Nuclear Information System (INIS)

    Yu Jinxiang; Ren Xiaotang; Song Zhizhong

    1996-01-01

    Progress of an end extraction sputtering PIG ion source with permanent magnet is introduced. Usually it is suitable for extracting single or multiple charged ions of gas and metal. At 20-30 kV extraction voltage, about mA of gas ions and tens of μA of metal ions are extracted, and the discharge power consumption less than 50 Watts. the negative ions of some elements with larger electron affinity, such as H, O and F, can be extracted directly. Using LaB 6 cathode and at 15-20 kV extraction voltage, more than 50 μA of H - , about 1.4 mA of O - and 1.8 mA of F - in total beam are extracted, the power consumption are about 40, 50 and 75 W, respectively

  20. Deposition of vanadium oxide films by direct-current magnetron reactive sputtering

    Science.gov (United States)

    Kusano, E.; Theil, J. A.; Thornton, John A.

    1988-01-01

    It is demonstrated here that thin films of vanadium oxide can be deposited at modest substrate temperatures by dc reactive sputtering from a vanadium target in an O2-Ar working gas using a planar magnetron source. Resistivity ratios of about 5000 are found between a semiconductor phase with a resistivity of about 5 Ohm cm and a metallic phase with a resistivity of about 0.001 Ohm cm for films deposited onto borosilicate glass substrates at about 400 C. X-ray diffraction shows the films to be single-phase VO2 with a monoclinic structure. The VO2 films are obtained for a narrow range of O2 injection rates which correspond to conditions where cathode poisoning is just starting to occur.

  1. Fabrication of electrocatalytic Ta nanoparticles by reactive sputtering and ion soft landing

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, Grant E.; Moser, Trevor; Engelhard, Mark; Browning, Nigel D.; Laskin, Julia

    2016-11-07

    About 40 years ago, it was shown that tungsten carbide exhibits similar catalytic behavior to Pt for certain commercially relevant reactions, thereby suggesting the possibility of cheaper and earth-abundant substitutes for costly and rare precious metal catalysts. In this work, reactive magnetron sputtering of Ta in the presence of three model hydrocarbons (2-butanol, heptane, and m-xylene) combined with gas aggregation and ion soft landing was employed to prepare organic-inorganic hybrid nanoparticles (NPs) on surfaces for evaluation of catalytic activity and durability. The electro-catalytic behavior of the NPs supported on glassy carbon was evaluated in acidic aqueous solution by cyclic voltammetry. The Ta-heptane and Ta-xylene NPs were revealed to be active and robust toward promotion of the oxygen reduction reaction, an important process occurring at the cathode in fuel cells. In comparison, pure Ta and Ta-butanol NPs were essentially unreactive. Characterization techniques including atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM) were applied to probe how different sputtering conditions such as the flow rates of gases, sputtering current, and aggregation length affect the properties of the NPs. AFM images reveal the focused size of the NPs as well as their preferential binding along the step edges of graphite surfaces. In comparison, TEM images of the same NPs on carbon grids show that they bind randomly to the surface with some agglomeration but little coalescence. The TEM images also reveal morphologies with crystalline cores surrounded by amorphous regions for NPs formed in the presence of 2-butanol and heptane. In contrast, NPs formed in the presence of m-xylene are amorphous throughout. XPS spectra indicate that while the percentage of Ta, C, and O in the NPs varies depending on the sputtering conditions and hydrocarbon employed, the electron binding energies of the elements are similar

  2. Cathode-follower power amplifier

    International Nuclear Information System (INIS)

    Giordano, S.; Puglisi, M.

    1983-01-01

    In circular accelerators and particularly in storage rings it is essential that the total impedance, as seen by the beam, be kept below some critical value. A model of the accelerating system was built using a single-ended cathode-follower amplifier driving a ferrite-loaded cavity. The system operated at 234.5 kHz with a peak output voltage of +-10 kV on the gap. The dynamic output impedance, as measured on the gap, was < 15 ohms

  3. RF magnetron sputtering of a hydroxyapatite target: A comparison study on polytetrafluorethylene and titanium substrates

    Science.gov (United States)

    Surmenev, Roman A.; Surmeneva, Maria A.; Grubova, Irina Yu.; Chernozem, Roman V.; Krause, Bärbel; Baumbach, Tilo; Loza, Kateryna; Epple, Matthias

    2017-08-01

    A pure hydroxyapatite (HA) target was used to prepare the biocompatible coating of HA on the surface of a polytetrafluorethylene (PTFE) substrate, which was placed on the same substrate holder with technically pure titanium (Ti) in the single deposition runs by radio-frequency (RF) magnetron sputtering. The XPS, XRD and FTIR analyses of the obtained surfaces showed that for all substrates, instead of the HA coating deposition, the coating of a mixture of calcium carbonate and calcium fluoride was grown. According to SEM investigations, the surface of PTFE was etched, and the surface topography of uncoated Ti was preserved after the depositions. The FTIR results reveal no phosphate bonds; only calcium tracks were observed in the EDX-spectra on the surface of the coated PTFE substrates. Phosphate oxide (V), which originated from the target, could be removed using a vacuum pump system, or no phosphate-containing bonds could be formed on the substrate surface because of the severe substrate bombardment process, which prevented the HA coating deposition. The observed results may be connected with the surface re-sputtering effect of the growing film by high-energy negatively charged ions (most probably oxygen or fluorine), which are accelerated in the cathode dark sheath.

  4. Self-sputtering during ion precipitation and its influence on niobium film properties

    International Nuclear Information System (INIS)

    Belevskij, V.P.; Gusev, I.V.

    1987-01-01

    Cathode sputtering of niobium films under conditions of vacuum condensation with simultaneous Nb + ion bombardment at energy of E n =(1.6...6.4)x10 -16 J is studied. Calculation of experimental values of the sputtering coefficient S Nb is performed with respect to the film thickness in the field of action of a niobium ion beam. Using the four-probe method in helium cryostats superconducting properties are studied and the film texture is determined by the X ray diffraction analysis. With the E n growth S Nb increases from 1.1 to 3.1. The best correspondence of the experimental dependence S Nb (E n ) is provided by the semiempirical formula of Yamamura Y. et al. The consequence of the S Nb increase is a sharp decrease of the effective condensation rate v eff . In case of niobium condensation at v eff m , where v m is the velocity of movement of a quasidiffusive boundary of impurities from the substrate according to the model of ion mixing developed by Carter G. and Armour D. suppresion of texture formation and deterioration of superconducting properties of superthin films (about 10 nm) is observed that results from ion mixing of the film and substrate materials on the interface. For such condensation conditions the substrate itself is the main source of impurities in the film

  5. Production of Zr-89 using sputtered yttrium coin targets 89Zr using sputtered yttrium coin targets.

    Science.gov (United States)

    Queern, Stacy Lee; Aweda, Tolulope Aramide; Massicano, Adriana Vidal Fernandes; Clanton, Nicholas Ashby; El Sayed, Retta; Sader, Jayden Andrew; Zyuzin, Alexander; Lapi, Suzanne Elizabeth

    2017-07-01

    An increasing interest in zirconium-89 ( 89 Zr) can be attributed to the isotope's half-life which is compatible with antibody imaging using positron emission tomography (PET). The goal of this work was to develop an efficient means of production for 89 Zr that provides this isotope with high radionuclidic purity and specific activity. We investigated the irradiation of yttrium sputtered niobium coins and compared the yields and separation efficiency to solid yttrium coins. The sputtered coins were irradiated with an incident beam energy of 17.5MeV or 17.8MeV providing a degraded transmitted energy through an aluminum degrader of 12.5MeV or 12.8MeV, respectively, with various currents to determine optimal cyclotron conditions for 89 Zr production. Dissolution of the solid yttrium coin took 2h with 50mL of 2M HCl and dissolution of the sputtered coin took 15-30min with 4mL of 2M HCl. During the separation of 89 Zr from the solid yttrium coins, 77.9 ± 11.2% of the activity was eluted off in an average of 7.3mL of 1M oxalic acid whereas for the sputtered coins, 91 ± 6% was eluted off in an average of 1.2mL of 1M oxalic acid with 100% radionuclidic purity. The effective specific activity determined via DFO-SCN titration from the sputtered coins was 108±7mCi/μmol as compared to 20.3mCi/μmol for the solid yttrium coin production. ICP-MS analysis of the yttrium coin and the sputtered coins showed 99.99% yttrium removed with 178μg of yttrium in the final solution and 99.93-100% of yttrium removed with remaining range of 0-42μg of yttrium in the final solution, respectively. The specific activity calculated for the solid coin and 3 different sputtered coins using the concentration of Zr found via ICP-MS was 140±2mCi/μmol, 300±30mCi/μmol, 410±60mCi/μmol and 1719±5mCi/μmol, respectively. Labeling yields of the 89 Zr produced via sputtered targets for 89 Zr- DFO-trastuzumab were >98%. Overall, these results show the irradiation of yttrium sputtered niobium coins

  6. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Z.L.

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error <10%) for m=3D0.2. It is also shown that, if the sputtering yield equals the corresponding one in Sigmund's theory, the depth of origin of sputtered atoms must be shorter than in Sigmund's theory for 0.25 m ≥ 3D 0. The former even may be only about one half of the latter as long as m=3D0. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)

  7. Pumping behavior of sputter ion pumps

    International Nuclear Information System (INIS)

    Chou, T.S.; McCafferty, D.

    The ultrahigh vacuum requirements of ISABELLE is obtained by distributed pumping stations. Each pumping station consists of 1000 l/s titanium sublimation pump for active gases (N 2 , H 2 , O 2 , CO, etc.), and a 20 l/s sputter ion pump for inert gases (methane, noble gases like He, etc.). The combination of the alarming production rate of methane from titanium sublimation pumps (TSP) and the decreasing pumping speed of sputter ion pumps (SIP) in the ultrahigh vacuum region (UHV) leads us to investigate this problem. In this paper, we first describe the essential physics and chemistry of the SIP in a very clean condition, followed by a discussion of our measuring techniques. Finally measured methane, argon and helium pumping speeds are presented for three different ion pumps in the range of 10 -6 to 10 -11 Torr. The virtues of the best pump are also discussed

  8. Origins of Beta Tantalum in Sputtered Coatings

    National Research Council Canada - National Science Library

    Mulligan, C

    2001-01-01

    .... Some of the most recent work has attempted to relate the energetics (i.e., atom/ion energy) of the plasma to the alpha right arrow beta transition. It has been shown that the energetics of the plasma can relate to the most crucial sputtering parameters. The most significant feature of the use of plasma energy to explain the alpha right arrow beta transition is that it relates the formation of beta-tantalum to a quantifiable measure.

  9. Sputter coating of microspherical substrates by levitation

    Science.gov (United States)

    Lowe, A.T.; Hosford, C.D.

    Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.

  10. Pipelines cathodic protection design methodologies for impressed ...

    African Journals Online (AJOL)

    Several inadequate designs of cathodically polarized offshore and onshore pipelines have been reported in Nigeria owing to design complexity and application of the cathodic protection system. The present study focused on critical and detailed approach in impressed current and sacrificial anode design calculation ...

  11. Future cathode materials for lithium rechargeable batteries

    Energy Technology Data Exchange (ETDEWEB)

    Ritchie, A.G.; Giwa, C.O.; Lee, J.C.; Bowles, P. [DERA, Gosport (United Kingdom); Gilmour, A.; Allan, J. [Lexcel Technology, Henley-on-Thames (United Kingdom); Rice, D.A.; Brady, F.; Tsang, S.C.E. [Reading Univ. (United Kingdom)

    1999-07-01

    Lithium rechargeable batteries are now well established as power sources for portable equipment, such as portable telephones or computers. Future applications include electric vehicles. However, before they can be used for this, or other price-sensitive applications, new cathode materials of much lower cost are needed. Possible cathode materials are reviewed. (orig.)

  12. pipelines cathodic protection design methodologies for impressed ...

    African Journals Online (AJOL)

    HOD

    Several inadequate designs of cathodically polarized offshore and onshore pipelines have been reported in Nigeria owing to design complexity and application of the cathodic protection system. The present study focused on critical and detailed approach in impressed current and sacrificial anode design calculation ...

  13. Carbon sputtering yield measurements at grazing incidence

    International Nuclear Information System (INIS)

    Kolasinski, Robert D.; Polk, James E.; Goebel, Dan; Johnson, Lee K.

    2008-01-01

    In this investigation, carbon sputtering yields were measured experimentally at varying angles of incidence under Xe + bombardment. The measurements were obtained by etching a coated quartz crystal microbalance (QCM) with a low energy ion beam. The material properties of the carbon targets were characterized with a scanning electron microscope (SEM) and Raman spectroscopy. C sputtering yields measured under Ar + and Xe + bombardment at normal incidence displayed satisfactory agreement with previously published data over an energy range of 200 eV-1 keV. For Xe + ions, the dependence of the yields on angle of incidence θ was determined for 0 o ≤ θ ≤ 80 deg. Over this range, an increase in C sputtering yield by a factor of 4.8 was observed, with the peak in yield occurring at 70 o . This is a much higher variation compared to Xe + → Mo yields under similar conditions, a difference that may be attributed to higher scattering of the incident particles transverse to the beam direction than in the case of Xe + → C. In addition, the variation of the yields with θ was not strongly energy dependent. Trapping of Xe in the surface was observed, in contrast to observations using the QCM technique with metallic target materials. Finally, target surface roughness was characterized using atomic force microscope measurements to distinguish between the effects of local and overall angle of incidence of the target

  14. Characterization of magnetron co-sputtered W-doped C-based films

    Energy Technology Data Exchange (ETDEWEB)

    Moura e Silva, C.W. [REDEMAT/CETEC - Laboratorio de Engenharia e Modificacoes de Superficies, CETEC, Av. Jose Candido da Silveira, 2000, Horto, 31.170-000, Belo Horizonte, Minas Gerais (Brazil); Branco, J.R.T. [REDEMAT/CETEC - Laboratorio de Engenharia e Modificacoes de Superficies, CETEC, Av. Jose Candido da Silveira, 2000, Horto, 31.170-000, Belo Horizonte, Minas Gerais (Brazil); Cavaleiro, A. [ICEMS - Grupo de Materiais e Engenharia de Superficies, Faculdade de Ciencias e Tecnologia da Universidade de Coimbra - Polo II - Pinhal de Marrocos, 3030-788 Coimbra (Portugal)]. E-mail: albano.cavaleiro@dem.uc.pt

    2006-11-23

    In this paper, W-doped C-based coatings were deposited on steel and silicon substrates by RF magnetron sputtering, using W and C targets, varying the cathode power applied to the W target and the substrate bias. The chemical composition was varied by placing the substrates in a row facing the C and W targets. W content in the films increased from 1 to 2 at.% over the C target to {approx} 73 at.% over the W target. The coatings with W content lower than {approx} 12 at.% and {approx} 23 at.%, for biased and unbiased conditions, respectively, showed X-ray amorphous structures, although carbide nanocrystals must exist as shown by the detection of the WC{sub 1-x} phase in films with higher W content. C-rich films were very dense and developed a columnar morphology with increasing W content. An improvement in the hardness (from 10 GPa, up to 25 GPa) of the films was achieved either when negative substrate bias was used in the deposition, or when the WC{sub 1-x} phase was detected by X-ray diffraction. The adhesion of the coatings is very low with spontaneous spallation of those deposited with negative substrate bias higher than 45 V. Varieties in cathode power (90 W or 120 W) applied to the W target showed no observable influence on the characteristics of the films.

  15. Influence of surface topography on the sputtering yields of silver

    International Nuclear Information System (INIS)

    Pan Jisheng; Wang Zhenxia; Tao Zhenlan; Zhang Jiping

    1992-01-01

    The sputtering yields of silver have been measured as a function of the fluence of incident Ar + ions (27 keV) using the collector technique and RBS analysis. The irradiated surface was examined by scanning electron microscopy (SEM). It is shown that the sputtering yields of surfaces with topography are enhanced relative to smooth surfaces of silver, but the extent of the enhancement depends on the irradiation dose. The experimental results can be explained assuming that the surface topography and sputtering yield are a function of incident angle. It is obvious that the surface topography is an important factor to influence the sputtering yield. The term ''apparent sputtering yield'' has specifically been used when referring to the experimental sputtering yield of a surface with topography, to emphasize the difference with a smooth surface. (orig.)

  16. Recent developments in reactively sputtered optical thin films

    Energy Technology Data Exchange (ETDEWEB)

    Pawlewicz, W.T.; Martin, P.M.; Hays, D.D.; Mann, I.B.

    1981-12-01

    Highlights of a multiyear effort to develop new or improved thin film optical coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of synthesizing broad classes of materials in a straightfoward manner. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be made by conventional evaporative techniques. Reactive sputtering is shown to allow precise control of coating composition, microstructure and the resulting optical properties. Examples of multilayer coatings such as all-dielectric and dielectric-enhanced mirrors made from reactively sputtered materials are included, and simple yet elegant fabrication techniques are introduced. The reactive sputtering technique and equipment used specifically for optical coatings are briefly described, and comparison is made with the conventional evaporative approach.

  17. Dwell time dependent morphological transition and sputtering yield of ion sputtered Sn

    International Nuclear Information System (INIS)

    Qian, H X; Zeng, X R; Zhou, W

    2010-01-01

    Self-organized nano-scale patterns may appear on a wide variety of materials irradiated with an ion beam. Good manipulation of these structures is important for application in nanostructure fabrication. In this paper, dwell time has been demonstrated to be able to control the ripple formation and sputtering yield on Sn surface. Ripples with a wavelength of 1.7 μm were observed for a dwell time in the range 3-20 μs, whereas much finer ripples with a wavelength of 540 nm and a different orientation were observed for a shorter dwell time in the range 0.1-2 μs. The sputtering yield increases with dwell time significantly. The results provide a new basis for further steps in the theoretical description of morphology evolution during ion beam sputtering.

  18. Formation of biocompatible surface layers depending on the sputtering distance

    Science.gov (United States)

    Nasakina, E. O.; Seregin, A. V.; Baikin, A. S.; Kaplan, M. A.; Konushkin, S. V.; Sergiyenko, K. V.; Kovaleva, E. D.; Kolmakova, A. A.; Leonov, A. V.; Sevost'yanov, M. A.; Kolmakov, A. G.; Simakov, S. V.

    2017-05-01

    Nano- and micro-dimensional surface layers of silver and tantalum on flat and wire NiTi substrates by the method of magnetron sputtering in vacuum were produced. The structure and composition of the samples were determined using SEM and Auger spectroscopy. With an increase in the sputtering distance, the thickness of the surface layers decreases, and the thickness of the transition layer and the dependence of the thickness change as a whole depend on the nature of the sputtered substance.

  19. Erosion of nanostructured tungsten by laser ablation, sputtering and arcing

    Directory of Open Access Journals (Sweden)

    Dogyun Hwangbo

    2017-08-01

    Full Text Available Mass loss of nanostructured tungsten, which was formed by helium plasma irradiation, due to laser ablation, sputtering, and arcing was investigated. Below the helium sputtering energy threshold (200eV. Reduction in sputtering on nanostructured surface was observed. Arcing was initiated using laser pulses, and the erosion rate by arcing was measured. The erosion rate increased with arc current, while the erosion per Coulomb was not affected by arc current.

  20. Energy dependent neutron sputtering and surface damage cross sections

    International Nuclear Information System (INIS)

    Odette, G.R.; Doiron, D.R.; Kennerley, R.J.

    1976-01-01

    The results clearly indicate that damage function analysis might be usefully applied to define both the neutron and primary recoil energy dependence of sputtering yields. Even with relatively large data errors, it appears that it is possible to both detect the existence and indicate the form of the deviation of sputtering yield from linear damage energy dependence (if such deviation exists). This information would be very useful in developing improved models of the sputtering phenomena

  1. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  2. Batteries: Overview of Battery Cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Doeff, Marca M

    2010-07-12

    The very high theoretical capacity of lithium (3829 mAh/g) provided a compelling rationale from the 1970's onward for development of rechargeable batteries employing the elemental metal as an anode. The realization that some transition metal compounds undergo reductive lithium intercalation reactions reversibly allowed use of these materials as cathodes in these devices, most notably, TiS{sub 2}. Another intercalation compound, LiCoO{sub 2}, was described shortly thereafter but, because it was produced in the discharged state, was not considered to be of interest by battery companies at the time. Due to difficulties with the rechargeability of lithium and related safety concerns, however, alternative anodes were sought. The graphite intercalation compound (GIC) LiC{sub 6} was considered an attractive candidate but the high reactivity with commonly used electrolytic solutions containing organic solvents was recognized as a significant impediment to its use. The development of electrolytes that allowed the formation of a solid electrolyte interface (SEI) on surfaces of the carbon particles was a breakthrough that enabled commercialization of Li-ion batteries. In 1990, Sony announced the first commercial batteries based on a dual Li ion intercalation system. These devices are assembled in the discharged state, so that it is convenient to employ a prelithiated cathode such as LiCoO{sub 2} with the commonly used graphite anode. After charging, the batteries are ready to power devices. The practical realization of high energy density Li-ion batteries revolutionized the portable electronics industry, as evidenced by the widespread market penetration of mobile phones, laptop computers, digital music players, and other lightweight devices since the early 1990s. In 2009, worldwide sales of Li-ion batteries for these applications alone were US$ 7 billion. Furthermore, their performance characteristics (Figure 1) make them attractive for traction applications such as

  3. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  4. Note: Coaxial-heater hollow cathode

    Science.gov (United States)

    Kurt, Huseyin; Kokal, Ugur; Turan, Nazli; Celik, Murat

    2017-06-01

    The design and tests of a LaB6 hollow cathode with a novel heater are presented. In the new design, the heater wire is completely encapsulated around the cathode tube and a coaxial return electrode, thereby eliminating hot spots on the heater wire due to the free hanging regions. Since the new heater confines the Joule heating to the region of interest, where the LaB6 emitter is placed, the heater terminals are further secured from overheating. The cathode with the presented heater design has been successfully tested and is able to deliver currents in the 0.5-15 A range.

  5. Note: Coaxial-heater hollow cathode.

    Science.gov (United States)

    Kurt, Huseyin; Kokal, Ugur; Turan, Nazli; Celik, Murat

    2017-06-01

    The design and tests of a LaB 6 hollow cathode with a novel heater are presented. In the new design, the heater wire is completely encapsulated around the cathode tube and a coaxial return electrode, thereby eliminating hot spots on the heater wire due to the free hanging regions. Since the new heater confines the Joule heating to the region of interest, where the LaB 6 emitter is placed, the heater terminals are further secured from overheating. The cathode with the presented heater design has been successfully tested and is able to deliver currents in the 0.5-15 A range.

  6. Pumping behavior of sputtering ion pump

    Energy Technology Data Exchange (ETDEWEB)

    Chou, T.S.; Bittner, J.; Schuchman, J.

    1991-12-31

    To optimize the design of a distributed ion pump (DIP) for the Superconducting X-Ray Lithography Source (SXLS) the stability of the rotating electron cloud at very high magnetic field beyond transition, must be re-examined. In this work the pumping speed and frequency spectrum of a DIP at various voltages (1 to 10 KV) and various magnetic fields (0.1 to 4 Tesla) are measured. Three cell diameters 10 mm, 5 mm and 2.5 mm, each 8 mm long, and with 3 or 4 mm gaps between anode and cathode are investigated. In this study both the titanium cathodes and the stainless steel anode plates are perforated with holes comparable in size to the anode cell diameters. Only the partially saturated pumping behavior is under investigation. The ultimate pressure and conditioning of the pump will be investigated at a later date when the stability criterion for the electron cloud is better understood.

  7. Pumping behavior of sputtering ion pump

    Energy Technology Data Exchange (ETDEWEB)

    Chou, T.S.; Bittner, J.; Schuchman, J.

    1991-01-01

    To optimize the design of a distributed ion pump (DIP) for the Superconducting X-Ray Lithography Source (SXLS) the stability of the rotating electron cloud at very high magnetic field beyond transition, must be re-examined. In this work the pumping speed and frequency spectrum of a DIP at various voltages (1 to 10 KV) and various magnetic fields (0.1 to 4 Tesla) are measured. Three cell diameters 10 mm, 5 mm and 2.5 mm, each 8 mm long, and with 3 or 4 mm gaps between anode and cathode are investigated. In this study both the titanium cathodes and the stainless steel anode plates are perforated with holes comparable in size to the anode cell diameters. Only the partially saturated pumping behavior is under investigation. The ultimate pressure and conditioning of the pump will be investigated at a later date when the stability criterion for the electron cloud is better understood.

  8. 49 CFR 192.463 - External corrosion control: Cathodic protection.

    Science.gov (United States)

    2010-10-01

    ... 49 Transportation 3 2010-10-01 2010-10-01 false External corrosion control: Cathodic protection... for Corrosion Control § 192.463 External corrosion control: Cathodic protection. (a) Each cathodic protection system required by this subpart must provide a level of cathodic protection that complies with one...

  9. Development of the sputter coater for hotcell

    Energy Technology Data Exchange (ETDEWEB)

    Chun, Yong Bum; Kwon, H. M.; Chun, Y. B.; Yang, Y. S.; Joo, J. S.; Jang, N. M

    2007-05-15

    In last december, the Wavelength Dispersive Spectroscopy (WDS) was installed on the shielded SEM of PIEF, KAERI. Before the first major WDS analysis service at the end of 2007, one among the prior technologies, the hot-cell sputter coater was remodelled from a commercial product and set up inside the glove box. This report describes effects of a coating layer on quantitative analysis, the remodelling of a coater suited to hot-cell, and the performance test of the remodelled coater. Also, written in 1998 was revised and appended to the report.

  10. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  11. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings. In this paper, principle and character of magnetron sputtering is introduced, and development of the hydroxyapatite and its composite coatings application is reviewed. In addition ...

  12. Beam optics optimization of a negative-ion sputter source

    Indian Academy of Sciences (India)

    795–804. Beam optics optimization of a negative-ion sputter source. F OSSWALD£ and R REBMEISTER. Institut de Recherches Subatomiques, UMR 7500 CNRS-IN2P3/ULP, BP 28,. 67037 Strasbourg Cedex 2, France. £Email: francis.osswald@ires.in2p3.fr. Abstract. A negative-ion sputter source has been studied in order ...

  13. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    RF sputtering: A viable tool for MEMS fabrication. 545 obtain highly c-axis oriented films, which is a requirement for these films to be piezoelectric in nature. In addition to the dielectric films, thin films of Cr, Au, Ti and Pt on silicon or glass substrates, (used for ZnO deposition) were also deposited by RF sputtering process.

  14. Lattice dynamics during electronic sputtering of solid Ne

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1997-01-01

    Electronic sputtering of solid neon has been studied with molecular dynamics. The cavity formation around an excited atom and particle migration in the surface region, as well as the sputtering process have been studied. A single atomic exciton has been observed to produce a desorption of up...

  15. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  16. Sputtering of rough surfaces: a 3D simulation study

    Science.gov (United States)

    von Toussaint, U.; Mutzke, A.; Manhard, A.

    2017-12-01

    The lifetime of plasma-facing components is critical for future magnetic confinement fusion power plants. A key process limiting the lifetime of the first-wall is sputtering by energetic ions. To provide a consistent modeling of the sputtering process of realistic geometries, the SDTrimSP-code has been extended to enable the processing of analytic as well as measured arbitrary 3D surface morphologies. The code has been applied to study the effect of varying the impact angle of ions on rough surfaces on the sputter yield as well as the influence of the aspect ratio of surface structures on the 2D distribution of the local sputtering yields. Depending on the surface morphologies reductions of the effective sputter yields to less than 25% have been observed in the simulation results.

  17. Development of plasma cathode electron guns

    Science.gov (United States)

    Oks, Efim M.; Schanin, Peter M.

    1999-05-01

    The status of experimental research and ongoing development of plasma cathode electron guns in recent years is reviewed, including some novel upgrades and applications to various technological fields. The attractiveness of this kind of e-gun is due to its capability of creating high current, broad or focused beams, both in pulsed and steady-state modes of operation. An important characteristic of the plasma cathode electron gun is the absence of a thermionic cathode, a feature which leads to long lifetime and reliable operation even in the presence of aggressive background gas media and at fore-vacuum gas pressure ranges such as achieved by mechanical pumps. Depending on the required beam parameters, different kinds of plasma discharge systems can be used in plasma cathode electron guns, such as vacuum arcs, constricted gaseous arcs, hollow cathode glows, and two kinds of discharges in crossed E×B fields: Penning and magnetron. At the present time, plasma cathode electron guns provide beams with transverse dimension from fractional millimeter up to about one meter, beam current from microamperes to kiloamperes, beam current density up to about 100 A/cm2, pulse duration from nanoseconds to dc, and electron energy from several keV to hundreds of keV. Applications include electron beam melting and welding, surface treatment, plasma chemistry, radiation technologies, laser pumping, microwave generation, and more.

  18. Thermal conductivities of thin, sputtered optical films

    International Nuclear Information System (INIS)

    Henager, C.H. Jr.; Pawlewicz, W.T.

    1991-05-01

    The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO 2 /Si 3 N 4 ) n and Al(Al 2 O 3 /AIN) n . Sputtered films of more conventional materials like SiO 2 , Al 2 O 3 , Ta 2 O 5 , Ti, and Si have also been measured. The data show that thin film thermal conductivities are typically 10 to 100 times lower than conductivities for the same materials in bulk form. Structural disorder in the amorphous or very fine-grained films appears to account for most of the conductivity difference. Conclusive evidence for a film/substrate interface contribution is presented

  19. Experimental and analytical study of the sputtering phenomena

    International Nuclear Information System (INIS)

    Howard, P.A.

    1976-03-01

    One form of the sputtering phenomena, the heat-transfer process that occurs when an initially hot vertical surface is cooled by a falling liquid film, was examined from a new experimental approach. The sputtering front is the lowest wetted position on the vertical surface and is characterized by a short region of intense nucleate boiling. The sputtering front progresses downward at nearly a constant rate, the surface below the sputtering front being dry and almost adiabatic. This heat-transfer process is of interest in the analysis of some of the performance aspects of emergency core-cooling systems of light-water reactors. An experimental apparatus was constructed to examine the heat-transfer characteristics of a sputtering front. In the present study, a heat source of sufficient intensity was located immediately below the sputtering front, which prevented its downward progress, thus permitting detailed measurements of steady-state surface temperatures throughout a sputtering front. Experimental evidence showed the sputtering front to correspond to a critical heat-flux (CHF) phenomenon. Data were obtained with water flow rates of 350-1600 lb/sub m//hr-ft and subcoolings of 40-140 0 F on a 3 / 8 -in. solid copper rod at 1 atm. A two-dimensional analytical model was developed to describe a stationary sputtering front where the wet-dry interface corresponds to a CHF phenomena and the dry zone is adiabatic. This model is nonlinear because of the temperature dependence of the heat-transfer coefficient in the wetted region and has yielded good agreement with data. A simplified one-dimensional approximation was developed which adequately describes these data. Finally, by means of a coordinate transformation and additional simplifying assumptions, this analysis was extended to analyze moving sputtering fronts, and reasonably good agreement with reported data was shown

  20. Advanced capabilities and applications of a sputter-RBS system

    International Nuclear Information System (INIS)

    Brijs, B.; Deleu, J.; Beyer, G.; Vandervorst, W.

    1999-01-01

    In previous experiments, sputter-RBS 1 has proven to be an ideal tool to study the interaction of low energy ions. This contribution employs the same methodology to identify surface contamination induced during sputtering and to the determine absolute sputter yields. In the first experiment ERDA analysis was used to study the evolution of Hydrogen contamination during sputter-RBS experiments. Since the determination of Hydrogen concentration in very thin near surface layers is frequently limited by the presence of a strong surface peak of Hydrogen originating from adsorbed contamination of the residual vacuum, removal of this contamination would increase the sensitivity for Hydrogen detection in the near sub surface drastically. Therefore low energy (12 keV) Argon sputtering was used to remove the Hydrogen surface peak. However enhanced Hydrogen adsorption was observed related to the Ar dose. This experiment shows that severe vacuum conditions and the use of high current densities/sputter yields are a prerequisite for an efficient detection of Hydrogen in the near surface layers. In the second experiment, an attempt was made to determine the sputter yield of Cu during low energy (12 keV) Oxygen bombardment. In order to determine the accumulated dose of the low energy ion beam, a separate Faraday cup in combination with a remote controlled current have been added to the existing sputter-RBS set-up. Alternating sputtering and RBS analysis seem to be an adequate tool for the determination of the absolute sputter yield of Cu and this as well in the as under steady state conditions

  1. On a relationship between the geometry of cones on sputtered surfaces and the angular dependence of sputtered yields

    International Nuclear Information System (INIS)

    Chadderton, L.T.

    1977-01-01

    It is widely believed that the phenomenon responsible for the familiar peak in the angular dependence of sputtered yields also gives rise to characteristic semiangles α of conical protruberances on sputtered surfaces. It is shown that α corresponds to the process giving rise to the minimum rather than the maximum. No accurate measurements of the minimum have yet been made. (Auth.)

  2. Outgassing rate analysis of a velvet cathode and a carbon fiber cathode

    Science.gov (United States)

    Li, An-Kun; Fan, Yu-Wei; Qian, Bao-Liang; Zhang, Zi-cheng; Xun, Tao

    2017-11-01

    In this paper, the outgassing-rates of a carbon fiber array cathode and a polymer velvet cathode are tested and discussed. Two different methods of measurements are used in the experiments. In one scheme, a method based on dynamic equilibrium of pressure is used. Namely, the cathode works in the repetitive mode in a vacuum diode, a dynamic equilibrium pressure would be reached when the outgassing capacity in the chamber equals the pumping capacity of the pump, and the outgassing rate could be figured out according to this equilibrium pressure. In another scheme, a method based on static equilibrium of pressure is used. Namely, the cathode works in a closed vacuum chamber (a hard tube), and the outgassing rate could be calculated from the pressure difference between the pressure in the chamber before and after the work of the cathode. The outgassing rate is analyzed from the real time pressure evolution data which are measured using a magnetron gauge in both schemes. The outgassing rates of the carbon fiber array cathode and the velvet cathode are 7.3 ± 0.4 neutrals/electron and 85 ± 5 neutrals/electron in the first scheme and 9 ± 0.5 neutrals/electron and 98 ± 7 neutrals/electron in the second scheme. Both the results of two schemes show that the outgassing rate of the carbon fiber array cathode is an order smaller than that of the velvet cathode under similar conditions, which shows that this carbon fiber array cathode is a promising replacement of the velvet cathode in the application of magnetically insulated transmission line oscillators and relativistic magnetrons.

  3. Studies on ion scattering and sputtering processes relevant to ion beam sputter deposition of multicomponent thin films

    International Nuclear Information System (INIS)

    Auciello, O.; Ameen, M.S.; Kingon, A.I.

    1989-01-01

    Results from computer simulation and experiments on ion scattering and sputtering processes in ion beam sputter deposition of high Tc superconducting and ferroelectric thin films are presented. It is demonstrated that scattering of neutralized ions from the targets can result in undesirable erosion of, and inert gas incorporation in, the growing films, depending on the ion/target atom ass ratio and ion beam angle of incidence/target/substrate geometry. The studies indicate that sputtering Kr + or Xe + ions is preferable to the most commonly used Ar + ions, since the undesirable phenomena mentioned above are minimized for the first two ions. These results are used to determine optimum sputter deposition geometry and ion beam parameters for growing multicomponent oxide thin films by ion beam sputter-deposition. 10 refs., 5 figs

  4. Fluence-dependent sputtering yield of micro-architectured materials

    Energy Technology Data Exchange (ETDEWEB)

    Matthes, Christopher S.R.; Ghoniem, Nasr M., E-mail: ghoniem@ucla.edu; Li, Gary Z.; Matlock, Taylor S.; Goebel, Dan M.; Dodson, Chris A.; Wirz, Richard E.

    2017-06-15

    Highlights: • Sputtering yield is shown to be transient and heavily dependent on surface architecture. • Fabricated nano- and Microstructures cause geometric re-trapping of sputtered material, which leads to a self-healing mechanism. • Initially, the sputtering yield of micro-architectured Mo is approximately 1/2 the value as that of a planar surface. • The study demonstrates that the sputtering yield is a dynamic property, dependent on the surface structure of a material. • A developed phenomenological model mathematically describes the transient behavior of the sputtering yield as a function of plasma fluence. - Abstract: We present an experimental examination of the relationship between the surface morphology of Mo and its instantaneous sputtering rate as function of low-energy plasma ion fluence. We quantify the dynamic evolution of nano/micro features of surfaces with built-in architecture, and the corresponding variation in the sputtering yield. Ballistic deposition of sputtered atoms as a result of geometric re-trapping is observed, and re-growth of surface layers is confirmed. This provides a self-healing mechanism of micro-architectured surfaces during plasma exposure. A variety of material characterization techniques are used to show that the sputtering yield is not a fundamental property, but that it is quantitatively related to the initial surface architecture and to its subsequent evolution. The sputtering yield of textured molybdenum samples exposed to 300 eV Ar plasma is roughly 1/2 of the corresponding value for flat samples, and increases with ion fluence. Mo samples exhibited a sputtering yield initially as low as 0.22 ± 5%, converging to 0.4 ± 5% at high fluence. The sputtering yield exhibits a transient behavior as function of the integrated ion fluence, reaching a steady-state value that is independent of initial surface conditions. A phenomenological model is proposed to explain the observed transient sputtering phenomenon, and to

  5. Compact Rare Earth Emitter Hollow Cathode

    Science.gov (United States)

    Watkins, Ronald; Goebel, Dan; Hofer, Richard

    2010-01-01

    A compact, high-current, hollow cathode utilizing a lanthanum hexaboride (LaB6) thermionic electron emitter has been developed for use with high-power Hall thrusters and ion thrusters. LaB6 cathodes are being investigated due to their long life, high current capabilities, and less stringent xenon purity and handling requirements compared to conventional barium oxide (BaO) dispenser cathodes. The new cathode features a much smaller diameter than previously developed versions that permit it to be mounted on axis of a Hall thruster ( internally mounted ), as opposed to the conventional side-mount position external to the outer magnetic circuit ("externally mounted"). The cathode has also been reconfigured to be capable of surviving vibrational loads during launch and is designed to solve the significant heater and materials compatibility problems associated with the use of this emitter material. This has been accomplished in a compact design with the capability of high-emission current (10 to 60 A). The compact, high-current design has a keeper diameter that allows the cathode to be mounted on the centerline of a 6- kW Hall thruster, inside the iron core of the inner electromagnetic coil. Although designed for electric propulsion thrusters in spacecraft station- keeping, orbit transfer, and interplanetary applications, the LaB6 cathodes are applicable to the plasma processing industry in applications such as optical coatings and semiconductor processing where reactive gases are used. Where current electrical propulsion thrusters with BaO emitters have limited life and need extremely clean propellant feed systems at a significant cost, these LaB6 cathodes can run on the crudest-grade xenon propellant available without impact. Moreover, in a laboratory environment, LaB6 cathodes reduce testing costs because they do not require extended conditioning periods under hard vacuum. Alternative rare earth emitters, such as cerium hexaboride (CeB6) can be used in this

  6. Removable air-cathode to overcome cathode biofouling in microbial fuel cells.

    Science.gov (United States)

    Oliot, Manon; Etcheverry, Luc; Bergel, Alain

    2016-12-01

    An innovative microbial fuel cell (MFC) design is described, which allows the air-cathode to be replaced easily without draining the electrolyte. MFCs equipped with 9-cm 2 or 50-cm 2 bioanodes provided 0.6 and 0.7W/m 2 (referred to the cathode surface area) and were boosted to 1.25 and 1.96W/m 2 , respectively, when the initial air-cathode was replaced by a new one. These results validate the practical interest of removable air-cathodes and evidence the importance of the cathode biofouling that takes place during the MFC starting phase. As this biofouling is compensated by the concomitant improvement of the bioanodes it cannot be detected on the power curves and may be a widespread cause of performance underestimation. Copyright © 2016 Elsevier Ltd. All rights reserved.

  7. A High Capacity Li-Ion Cathode: The Fe(III/VI Super-Iron Cathode

    Directory of Open Access Journals (Sweden)

    Stuart Licht

    2010-05-01

    Full Text Available A super-iron Li-ion cathode with a 3-fold higher reversible capacity (a storage capacity of 485 mAh/g is presented. One of the principle constraints to vehicle electrification is that the Li-ion cathode battery chemistry is massive, and expensive. Demonstrated is a 3 electron storage lithium cathodic chemistry, and a reversible Li super-iron battery, which has a significantly higher capacity than contemporary Li-ion batteries. The super-iron Li-ion cathode consists of the hexavalent iron (Fe(VI salt, Na2FeO4, and is formed from inexpensive and clean materials. The charge storage mechanism is fundamentally different from those of traditional lithium ion intercalation cathodes. Instead, charge storage is based on multi-electron faradaic reduction, which considerably enhances the intrinsic charge storage capacity.

  8. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  9. Reactive dual magnetron sputtering for large area application

    International Nuclear Information System (INIS)

    Struempfel, J.

    2002-01-01

    Production lines for large area coating demand high productivity of reactive magnetron sputtering processes. Increased dynamic deposition rates for oxides and nitrides were already obtained by using of highly powered magnetrons in combination with advanced sputter techniques. However, besides high deposition rates the uniformity of such coatings has to be carefully considered. First the basics of reactive sputtering processes and dual magnetron sputtering are summarized. Different methods for process stabilization and control are commonly used for reactive sputtering. The Plasma Emission Monitor (PE M) offers the prerequisite for fast acting process control derived from the in-situ intensity measurements of a spectral line of the sputtered target material. Combined by multiple Plasma Emission Monitor control loops segmented gas manifolds are able to provide excellent thin film uniformity at high deposition rates. The Dual Magnetron allows a broad range of processing by different power supply modes. Medium frequency, DC and pulsed DC power supplies can be used for high quality layers. Whereas the large area coating of highly isolating layers like TiO 2 or SiO 2 is dominated by MF sputtering best results for coating with transparent conductive oxides are obtained by dual DC powering of the dual magnetron arrangement. (Author)

  10. Transport theory of sputtering I: Depth of origin of sputtered atoms

    International Nuclear Information System (INIS)

    Zhang, Zhu Lin

    1999-01-01

    Sputter theory employing a sum of two power cross sections has been implemented. Compared with the well known Lindhard power cross section (V∝r -1/m ), a sum of two such cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m ∼ 0.1). By using both one and two power cross sections, we have solved the linear transport equations describing the sputtering problem asymptotically. As usual, electronic stopping is ignored in the analysis. It has further been proved that Falcone's theory of the atom ejection process contradicts transport theory. The Andersen-Sigmund relation for partial sputtering yield ratios between two elements in an arbitrary multicomponent target has been derived by both methods. The energy deposited in the target surface layers has been computed for a few typical ion-target combinations. The numerical curves show that both theories generate almost the same results (error m≥0. The former even may be only about one half of the latter as long as m=0

  11. Closed field magnetron sputtering: new generation sputtering process for optical coatings

    Science.gov (United States)

    Gibson, D. R.; Brinkley, I.; Waddell, E. M.; Walls, J. M.

    2008-09-01

    "Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to <+/-1% is accomplished simply using time, although optical monitoring can be used for more demanding applications. Fine layer thickness control and deposition of graded index layers is also assisted with a specially designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide and carbide films. Benefits of the CFM sputter process are described.

  12. Sputtered protective coatings for die casting dies

    Science.gov (United States)

    Mirtich, M. J.; Nieh, C.-Y.; Wallace, J. F.

    1981-01-01

    Three experimental research designs investigating candidate materials and processes involved in protective die surface coating procedures by sputter deposition, using ion beam technologies, are discussed. Various pre-test results show that none of the coatings remained completely intact for 15,000 test cycles. The longest lifetime was observed for coatings such as tungsten, platinum, and molybdenum which reduced thermal fatigue, but exhibited oxidation and suppressed crack initiation only as long as the coating did not fracture. Final test results confirmed earlier findings and coatings with Pt and W proved to be the candidate materials to be used on a die surface to increase die life. In the W-coated specimens, which remained intact on the surface after thermal fatigue testing, no oxidation was found under the coating, although a few cracks formed on the surface where the coating broke down. Further research is planned.

  13. Magnetostrictive thin films prepared by RF sputtering

    International Nuclear Information System (INIS)

    Carabias, I.; Martinez, A.; Garcia, M.A.; Pina, E.; Gonzalez, J.M.; Hernando, A.; Crespo, P.

    2005-01-01

    Fe 80 B 20 thin films have been prepared by ion beam sputtering magnetron on room temperature. The films were fabricated on different substrates to compare the different magnetic and structural properties. In particular the growth of films on flexible substrates (PDMS, Kapton) has been studied to allow a simple integration of the system in miniaturized magnetostrictive devices. X-ray diffraction patterns indicate that films are mainly amorphous although the presence of some Fe nanoparticles cannot be ruled out. The coercive field of thin films ranges between 15 and 35 Oe, depending on substrate. Magnetostriction measurements indicate the strong dependence of the saturation magnetostriction with the substrate. Samples on flexible substrates exhibit a better performance than samples deposited onto glass substrates

  14. Fuzzy tungsten in a magnetron sputtering device

    Energy Technology Data Exchange (ETDEWEB)

    Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)

    2016-11-15

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  15. Fuzzy tungsten in a magnetron sputtering device

    International Nuclear Information System (INIS)

    Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.

    2016-01-01

    Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24  m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24  m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

  16. Manganese Dioxide As Rechargeable Magnesium Battery Cathode

    Energy Technology Data Exchange (ETDEWEB)

    Ling, Chen, E-mail: chen.ling@toyota.com; Zhang, Ruigang [Toyota Research Institute of North America, Ann Arbor, MI (United States)

    2017-11-03

    Rechargeable magnesium battery (rMB) has received increased attention as a promising alternative to current Li-ion technology. However, the lack of appropriate cathode that provides high-energy density and good sustainability greatly hinders the development of practical rMBs. To date, the successful Mg{sup 2+}-intercalation was only achieved in only a few cathode hosts, one of which is manganese dioxide. This review summarizes the research activity of studying MnO{sub 2} in magnesium cells. In recent years, the cathodic performance of MnO{sub 2} was impressively improved to the capacity of >150–200 mAh g{sup −1} at voltage of 2.6–2.8 V with cyclability to hundreds or more cycles. In addition to reviewing electrochemical performance, we sketch a mechanistic picture to show how the fundamental understanding about MnO{sub 2} cathode has been changed and how it paved the road to the improvement of cathode performance.

  17. Manganese Dioxide As Rechargeable Magnesium Battery Cathode

    International Nuclear Information System (INIS)

    Ling, Chen; Zhang, Ruigang

    2017-01-01

    Rechargeable magnesium battery (rMB) has received increased attention as a promising alternative to current Li-ion technology. However, the lack of appropriate cathode that provides high-energy density and good sustainability greatly hinders the development of practical rMBs. To date, the successful Mg 2+ -intercalation was only achieved in only a few cathode hosts, one of which is manganese dioxide. This review summarizes the research activity of studying MnO 2 in magnesium cells. In recent years, the cathodic performance of MnO 2 was impressively improved to the capacity of >150–200 mAh g −1 at voltage of 2.6–2.8 V with cyclability to hundreds or more cycles. In addition to reviewing electrochemical performance, we sketch a mechanistic picture to show how the fundamental understanding about MnO 2 cathode has been changed and how it paved the road to the improvement of cathode performance.

  18. Structure adhesion and corrosion resistance study of tungsten bisulfide doped with titanium deposited by DC magnetron co-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    De La Roche, J. [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); González, J.M. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Restrepo-Parra, E., E-mail: erestrepop@unal.edu.co [Laboratorio de Física del Plasma, Universidad Nacional de Colombia Sede Manizales, Km. 9 vía al aeropuerto, Campus La Nubia, Manizales (Colombia); Sequeda, F. [Laboratorio de Recubrimientos Duros y Aplicaciones Industriales – RDAI, Universidad del Valle, Calle 13 N° 100-00 Ciudadela Meléndez, Cali (Colombia); Alleh, V.; Scharf, T.W. [The University of North Texas, Department of Materials Science and Engineering, Denton, TX 76203 (United States)

    2014-11-30

    Highlights: • Ti-doped WS{sub 2} films were grown via the magnetron co-sputtering technique. • At a high Ti percentage, the crystalline structure of WS{sub 2} coatings tends to be amorphous. • As the Ti percentage increases in WS{sub 2} coatings, nanocomposites tend to form. • Ti-doped WS{sub 2} films have elastic behavior compared with the plastic response of pure WS{sub 2} films. • A high Ti percentage increases the corrosion resistance of WS{sub 2} films. - Abstract: Titanium-doped tungsten bisulfide thin films (WS{sub 2}-Ti) were grown using a DC magnetron co-sputtering technique on AISI 304 stainless steel and silicon substrates. The films were produced by varying the Ti cathode power from 0 to 25 W. Using energy dispersive spectroscopy (EDS), the concentration of Ti in the WS{sub 2} was determined, and a maximum of 10% was obtained for the sample grown at 25 W. Moreover, the S/W ratio was calculated and determined to increase as a function of the Ti cathode power. According to transmission electron microscopy (TEM) results, at high titanium concentrations (greater than 6%), nanocomposite formation was observed, with nanocrystals of Ti embedded in an amorphous matrix of WS{sub 2}. Using the scratch test, the coatings’ adhesion was analyzed, and it was observed that as the Ti percentage was increased, the critical load (Lc) also increased. Furthermore, the failure type changed from plastic to elastic. Finally, the corrosion resistance was evaluated using the electrochemical impedance spectroscopy (EIS) technique, and it was observed that at high Ti concentrations, the corrosion resistance was improved, as Ti facilitates coating densification and generates a protective layer.

  19. A hollow cathode ion source for production of primary ions for the BNL electron beam ion source

    Science.gov (United States)

    Alessi, James; Beebe, Edward; Carlson, Charles; McCafferty, Daniel; Pikin, Alexander; Ritter, John

    2014-02-01

    A hollow cathode ion source, based on one developed at Saclay, has been modified significantly and used for several years to produce all primary 1+ ions injected into the Relativistic Heavy Ion Collider Electron Beam Ion Source (EBIS) at Brookhaven. Currents of tens to hundreds of microamperes have been produced for 1+ ions of He, C, O, Ne, Si, Ar, Ti, Fe, Cu, Kr, Xe, Ta, Au, and U. The source is very simple, relying on a glow discharge using a noble gas, between anode and a solid cathode containing the desired species. Ions of both the working gas and ionized sputtered cathode material are extracted, and then the desired species is selected using an ExB filter before being transported into the EBIS trap for charge breeding. The source operates pulsed with long life and excellent stability for most species. Reliable ignition of the discharge at low gas pressure is facilitated by the use of capacitive coupling from a simple toy plasma globe. The source design, and operating experience for the various species, is presented.

  20. Synchrotron Investigations of SOFC Cathode Degradation

    Energy Technology Data Exchange (ETDEWEB)

    Idzerda, Yves

    2013-09-30

    The atomic variations occurring in cathode/electrolyte interface regions of La{sub 1-x}Sr{sub x}Co{sub y}Fe{sub 1-y}O{sub 3-δ} (LSCF) cathodes and other SOFC related materials have been investigated and characterized using soft X-ray Absorption Spectroscopy (XAS) and diffuse soft X-ray Resonant Scattering (XRS). X-ray Absorption Spectroscopy in the soft X-ray region (soft XAS) is shown to be a sensitive technique to quantify the disruption that occurs and can be used to suggest a concrete mechanism for the degradation. For LSC, LSF, and LSCF films, a significant degradation mechanism is shown to be Sr out-diffusion. By using the XAS spectra of hexavalent Cr in SrCrO4 and trivalent Cr in Cr2O3, the driving factor for Sr segregation was identified to be the oxygen vacancy concentration at the anode and cathode side of of symmetric LSCF/GDC/LSCF heterostructures. This is direct evidence of vacancy induced cation diffusion and is shown to be a significant indicator of cathode/electrolyte interfacial degradation. X-ray absorption spectroscopy is used to identify the occupation of the A-sites and B-sites for LSC, LSF, and LSCF cathodes doped with other transition metals, including doping induced migration of Sr to the anti-site for Sr, a significant cathode degradation indicator. By using spatially resolved valence mapping of Co, a complete picture of the surface electrochemistry can be determined. This is especially important in identifying degradation phenomena where the degradation is spatially localized to the extremities of the electrochemistry and not the average. For samples that have electrochemical parameters that are measured to be spatially uniform, the Co valence modifications were correlated to the effects of current density, overpotential, and humidity.

  1. Reactive magnetron sputtering of tungsten disulfide (WS2-x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry

    International Nuclear Information System (INIS)

    Weiss, V.; Seeger, S.; Ellmer, K.; Mientus, R.

    2007-01-01

    Tungsten disulfide (WS 2-x ) films (0.07≤x≤0.7) were prepared by reactive magnetron sputtering from a tungsten target in rare gas/H 2 S atmospheres and at substrate temperatures up to 620 degree sign C. The nucleation and growth of the films were investigated by in situ energy dispersive x-ray diffraction (EDXRD) and by ex situ techniques such as electron microscopy, elastic recoil detection analysis, and x-ray reflectivity. From the EDXRD analysis it was found that the films always nucleate with the (001) planes, i.e., the van der Waals planes, parallel to the substrate surface. For high deposition rates and/or low substrate temperatures a texture crossover from the (001) to the (100) crystallite orientation occurs during the growth. High deposition rates, low substrate temperatures, or low sputtering pressures lead to a significant lattice expansion of the crystallites in the c direction (up to 3%). This is most probably caused by a disturbed or turbostratic film growth induced by the energetic bombardment during film deposition. Reflected and neutralized energetic ions (Ar 0 ,S 0 ) from the tungsten target and negative ions (S - ) accelerated in the cathode dark space constitute the main sources of the energetic bombardment leading to crystallographic defects. The energy of these particles can be tailored by (i) thermalization between target and substrate in the sputtering gas or (ii) by a reduction of the discharge or target voltage, respectively, by high frequency excitation of the plasma. Films deposited under favorable conditions with respect to low particle energies and at substrate temperatures higher than 200 degree sign C exhibit a significant sulfur deficiency of up to about 5 at. % compared to the stoichiometric composition of WS 2 . This is ascribed to an energetic particle bombardment-induced sulfur desorption from the growing films

  2. Antibacterial properties of palladium nanostructures sputtered on polyethylene naphthalate

    Czech Academy of Sciences Publication Activity Database

    Polívková, M.; Válová, M.; Siegel, J.; Rimpelová, S.; Hubáček, Tomáš; Lyutakov, O.; Švorčík, V.

    2015-01-01

    Roč. 5, č. 90 (2015), s. 73767-73774 ISSN 2046-2069 Institutional support: RVO:60077344 Keywords : polymer * palladium sputtering * annealing * nanostructure * antibacterial effect Subject RIV: JJ - Other Materials Impact factor: 3.289, year: 2015

  3. Sputter-Resistant Materials for Electric Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using electric...

  4. Development of ion beam sputtering techniques for actinide target preparation

    International Nuclear Information System (INIS)

    Aaron, W.S.; Zevenbergen, L.A.; Adair, H.L.

    1985-01-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed. (orig.)

  5. Sputter deposition of metallic thin film and directpatterning

    Energy Technology Data Exchange (ETDEWEB)

    Ji, L.; Chen, Y.; Jiang, X.; Ji, Q.; Leung, K.-N.

    2005-09-09

    A compact apparatus is developed for deposition of metal thin film. The system employs an RF discharge plasma source with a straight RF antenna, which is made of or covered with deposition material, serving as sputtering target at the same time. The average deposition rate of copper thin film is as high as 450nm/min. By properly allocating the metal materials on the sputtering antenna, mixture deposition of multiple metal species is achieved. Using an ion beam imprinting scheme also taking advantage of ion beam focusing technique, two different schemes of direct patterning deposition process are developed: direct depositing patterned metallic thin film and resistless ion beam sputter patterning. Preliminary experiments have demonstrated direct pattern transfer from a template with feature size of micro scale; patterns with more than 10x reduction are achieved by sputtering patterning method.

  6. Ferroelectric Cathodes in Transverse Magnetic Fields

    International Nuclear Information System (INIS)

    Alexander Dunaevsky; Yevgeny Raitses; Nathaniel J. Fisch

    2002-01-01

    Experimental investigations of a planar ferroelectric cathode in a transverse magnetic field up to 3 kGs are presented. It is shown that the transverse magnetic field affects differently the operation of ferroelectric plasma cathodes in ''bright'' and ''dark'' modes in vacuum. In the ''bright'' mode, when the surface plasma is formed, the application of the transverse magnetic field leads to an increase of the surface plasma density. In the ''dark'' mode, the magnetic field inhibits the development of electron avalanches along the surface, as it does similarly in other kinds of surface discharges in the pre-breakdown mode

  7. Cathode architectures for alkali metal / oxygen batteries

    Science.gov (United States)

    Visco, Steven J; Nimon, Vitaliy; De Jonghe, Lutgard C; Volfkovich, Yury; Bograchev, Daniil

    2015-01-13

    Electrochemical energy storage devices, such as alkali metal-oxygen battery cells (e.g., non-aqueous lithium-air cells), have a cathode architecture with a porous structure and pore composition that is tailored to improve cell performance, especially as it pertains to one or more of the discharge/charge rate, cycle life, and delivered ampere-hour capacity. A porous cathode architecture having a pore volume that is derived from pores of varying radii wherein the pore size distribution is tailored as a function of the architecture thickness is one way to achieve one or more of the aforementioned cell performance improvements.

  8. DARHT 2 kA Cathode Development

    Energy Technology Data Exchange (ETDEWEB)

    Henestroza, E.; Houck, T.; Kwan, J.W.; Leitner, M.; Miram, G.; Prichard, B.; Roy, P.K.; Waldron, W.; Westenskow, G.; Yu, S.; Bieniosek, F.M.

    2009-03-09

    In the campaign to achieve 2 kA of electron beam current, we have made several changes to the DARHT-II injector during 2006-2007. These changes resulted in a significant increase in the beam current, achieving the 2 kA milestone. Until recently (before 2007), the maximum beam current that was produced from the 6.5-inch diameter (612M) cathode was about 1300 A when the cathode was operating at a maximum temperature of 1140 C. At this temperature level, the heat loss was dominated by radiation which is proportional to temperature to the fourth power. The maximum operating temperature was limited by the damage threshold of the potted filament and the capacity of the filament heater power supply, as well as the shortening of the cathode life time. There were also signs of overheating at other components in the cathode assembly. Thus it was clear that our approach to increase beam current could not be simply trying to run at a higher temperature and the preferred way was to operate with a cathode that has a lower work function. The dispenser cathode initially used was the type 612M made by SpectraMat. According to the manufacturer's bulletin, this cathode should be able to produce more than 10 A/cm{sup 2} of current density (corresponding to 2 kA of total beam current) at our operating conditions. Instead the measured emission (space charge limited) was 6 A/cm{sup 2}. The result was similar even after we had revised the activation and handling procedures to adhere more closely to the recommend steps (taking longer time and nonstop to do the out-gassing). Vacuum was a major concern in considering the cathode's performance. Although the vacuum gauges at the injector vessel indicated 10{sup -8} Torr, the actual vacuum condition near the cathode in the central region of the vessel, where there might be significant out-gassing from the heater region, was never determined. Poor vacuum at the surface of the cathode degraded the emission (by raising the work function

  9. DARHT 2 kA Cathode Development

    International Nuclear Information System (INIS)

    Henestroza, E.; Houck, T.; Kwan, J.W.; Leitner, M.; Miram, G.; Prichard, B.; Roy, P.K.; Waldron, W.; Westenskow, G.; Yu, S.; Bieniosek, F.M.

    2009-01-01

    In the campaign to achieve 2 kA of electron beam current, we have made several changes to the DARHT-II injector during 2006-2007. These changes resulted in a significant increase in the beam current, achieving the 2 kA milestone. Until recently (before 2007), the maximum beam current that was produced from the 6.5-inch diameter (612M) cathode was about 1300 A when the cathode was operating at a maximum temperature of 1140 C. At this temperature level, the heat loss was dominated by radiation which is proportional to temperature to the fourth power. The maximum operating temperature was limited by the damage threshold of the potted filament and the capacity of the filament heater power supply, as well as the shortening of the cathode life time. There were also signs of overheating at other components in the cathode assembly. Thus it was clear that our approach to increase beam current could not be simply trying to run at a higher temperature and the preferred way was to operate with a cathode that has a lower work function. The dispenser cathode initially used was the type 612M made by SpectraMat. According to the manufacturer's bulletin, this cathode should be able to produce more than 10 A/cm 2 of current density (corresponding to 2 kA of total beam current) at our operating conditions. Instead the measured emission (space charge limited) was 6 A/cm 2 . The result was similar even after we had revised the activation and handling procedures to adhere more closely to the recommend steps (taking longer time and nonstop to do the out-gassing). Vacuum was a major concern in considering the cathode's performance. Although the vacuum gauges at the injector vessel indicated 10 -8 Torr, the actual vacuum condition near the cathode in the central region of the vessel, where there might be significant out-gassing from the heater region, was never determined. Poor vacuum at the surface of the cathode degraded the emission (by raising the work function value). We reexamined

  10. Cathode characterization system: preliminary results with (Ba,Sr,Ca) O coated cathodes

    International Nuclear Information System (INIS)

    Nono, M.C.A.; Goncalves, J.A.N.; Barroso, J.J.; Dallaqua, R.S.; Spassovsky, I.

    1993-01-01

    The performance of a cathode characterization system for studying the emission parameters of thermal electron emitters is reported. The system consists of vacuum chamber, power supplies and equipment for measuring and control. Measurements have been taken of the emission current as function of cathode temperature and anode voltage. Several (Ba, Sr) O coated cathodes were tested and the results have shown good agreement with Child's and Richardson's laws. The experimental work function is between 1.0 and 2.0 e V. All emission parameters measured are consistent with international literature data. (author)

  11. Long Life Cold Cathodes for Hall effect Thrusters, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — An electron source incorporating long life, high current density cold cathodes inside a microchannel plate for use with ion thrusters is proposed. Cathode lifetime...

  12. Nano-Particle Scandate Cathode for Space Communications Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose an improved cathode based on our novel theory of the role of scandium oxide in enhancing emission in tungsten impregnate cathodes. Recent results have...

  13. Reservoir Cathode for Electric Space Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose a hollow reservoir cathode to improve performance in ion and Hall thrusters. We will adapt our existing reservoir cathode technology to this purpose....

  14. Reservoir Scandate Cathode for Electric Propulsion, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to combine the two most powerful cathode technologies into one hollow cathode assembly for use in ion and Hall-effect thrusters. Together, these...

  15. Review on MIEC Cathode Materials for Solid Oxide Fuel Cells

    Science.gov (United States)

    Burnwal, Suman Kumar; Bharadwaj, S.; Kistaiah, P.

    2016-11-01

    The cathode is one of the most important components of solid oxide fuel cells (SOFCs). The reduction of oxygen at the cathode (traditional cathodes like LSM, LSGM, etc.) is the slow step in the cell reaction at intermediate temperature (600-800∘C) which is one of the key obstacles to the development of SOFCs. The mixed ionic and electronic conducting cathode (MIEC) like LSCF, BSCF, etc., has recently been proposed as a promising cathode material for SOFC due to the improvement of the kinetic of the cathode reaction. The MIEC materials provide not only the electrons for the reduction of oxygen, but also the ionic conduction required to ensure the transport of the formed oxygen ions and thereby improves the overall electrochemical performance of SOFC system. The characteristics of MIEC cathode materials and its comparison with other traditional cathode materials is studied and presented in the paper.

  16. Klystron Amplifier Utilizing Scandate Cathode and Electrostatic Focusing, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to build an electrostatically focused klystron that exploits recent breakthroughs in scandate cathode technology. We have built cathodes with greater than...

  17. Characterization of sp3bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy.

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-05

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2kV and a power supply system equipped with 25/50μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp 3 /sp 2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp 3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp 3 /sp 2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp 3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed. Copyright © 2018 Elsevier B.V. All rights reserved.

  18. Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films

    International Nuclear Information System (INIS)

    Stranak, Vitezslav; Hippler, Rainer; Cada, Martin; Hubicka, Zdenek; Tichy, Milan

    2010-01-01

    Time-resolved comparative study of dual magnetron sputtering (dual-MS) and dual high power impulse magnetron sputtering (dual-HiPIMS) systems arranged with closed magnetic field is presented. The dual-MS system was operated with a repetition frequency 4.65 kHz (duty cycle ≅50%). The frequency during dual-HiPIMS is lower as well as its duty cycle (f=100 Hz, duty 1%). Different metallic targets (Ti, Cu) and different cathode voltages were applied to get required stoichiometry of Ti-Cu thin films. The plasma parameters of the interspace between magnetrons in the substrate position were investigated by time-resolved optical emission spectroscopy, Langmuir probe technique, and measurement of ion fluxes to the substrate. It is shown that plasma density as well as ion flux is higher about two orders of magnitude in dual-HiPIMS system. This fact is partially caused by low diffusion of ionized sputtered particles (Ti + ,Cu + ) which creates a preionized medium.

  19. Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy

    Science.gov (United States)

    Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

    2018-04-01

    This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2 kV and a power supply system equipped with 25/50 μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp3/sp2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp3/sp2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed.

  20. Grafting of Gold Nanoparticles on Glass Using Sputtered Gold Interlayers

    OpenAIRE

    Kvítek, Ondřej; Hendrych, Robin; Kolská, Zdeňka; Švorčík, Václav

    2014-01-01

    Three-step preparation of nanostructured Au layer on glass substrate is described. The procedure starts with sputtered gold interlayer, followed by grafting with dithiols and final coverage with gold nanoparticles (AuNPs). Successful binding of dithiols on the sputtered Au film was confirmed by X-ray photoelectron spectroscopy measurement. AuNPs bound to the surface were observed using atomic force microscopy. Both single nanoparticles and their aggregates were observed. UV-Vis spectra show b...

  1. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    TECS

    Abstract. For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO2 gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8⋅5 mbar for 18 h. Argon and ...

  2. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...... bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film....

  3. Simple model of surface roughness for binary collision sputtering simulations

    International Nuclear Information System (INIS)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-01-01

    Highlights: • A simple model of surface roughness is proposed. • Its key feature is a linearly varying target density at the surface. • The model can be used in 1D/2D/3D Monte Carlo binary collision simulations. • The model fits well experimental glancing incidence sputtering yield data. - Abstract: It has been shown that surface roughness can strongly influence the sputtering yield – especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the “density gradient model”) which imitates surface roughness effects. In the model, the target’s atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient – leading to increased sputtering yields, similar in effect to surface roughness.

  4. Application of torsion vacuum microbalance to sputtering yield measurement

    International Nuclear Information System (INIS)

    Akaishi, Kenya; Miyahara, Akira; Sukenobu, Satoru; Komizo, Mutsuo.

    1977-01-01

    The torsion vacuum microbalance technique useful for the determination of the sputtering yield of wall materials for fusion reactors was developed. In order to measure the rate of weight change of the samples during sputtering continuously, it is very important to keep the null point drift of the microbalance as small as possible. The deflection angle of the balance beam was detected and amplified by optical lever, and was transformed to electrical output by linear photopotentiometer. The null point drift wave mainly caused by temperature change in the laboratory, which induced relative displacement by thermal expansion between the balance system and the optical measuring system. The drift was reduced less than the equivalent weight of 4 x 10 -7 g/hr when the balance system wosset in the thermostat kept at 20 +- 0.5 0 C. The sensitivity of the balance was 8.3 x 10 -7 g/mV. The microbalance technique developed was applied to the measurement of sputtering yield of Cu by Ar + . The measurement was carried out with Ar + ion energy of 0.2 -- 2 keV, beam current of 0.5 -- 1.5 μA, and sputtering time of 2 hrs. The initial weight of Cu sample was 0.4g (15 mm x 15 mm sheet) and the sample temperature during sputtering was about 120 0 C. The sputtering yields obtained show good agreement with the results reported by Wehner et al. (auth.)

  5. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson

    2000-03-31

    . However, they have the potential of being useful as an interface on the anode side of the electrolyte. NexTech has focused much of its effort during the past few months on establishing tape casting methods for porous LSM substrates. This work, performed under a separate DOE-funded program, involved tape casting formulations comprising LSM powders with bi-modal particle size distributions and fugitive pore forming additives. Sintered LSM substrates with porosities in the 30 to 40 vol% range, and pore sizes of 10 {approx} 20 microns have been prepared. In addition, tape casting formulations involving composite mixtures of LSM and Sm-doped ceria (SDC) have been evaluated. The LSM/SDC cathode substrates are expected to provide better performance at low temperatures. Characterization of these materials is currently underway.

  6. LOW TEMPERATURE CATHODE SUPPORTED ELECTROLYTES

    Energy Technology Data Exchange (ETDEWEB)

    Harlan U. Anderson; Wayne Huebner; Igor Kosacki

    2001-09-30

    This project has three main goals: Thin Films Studies, Preparation of Graded Porous Substrates and Basic Electrical Characterization and testing of Planar Single Cells. In this portion of study we have focused on producing YSZ films on porous LSM substrates. When using the polymer precursor there are a number of obstacles to overcome in order to form dense electrolyte layers on porous substrates (cathode or anode). Probably the most difficult problems are: (1) Extreme penetration of the polymer into the substrate must be prevented. (2) Shrinkage cracking must be avoided. (3) Film thickness in the 1 to 5{micro}m range must be achieved. We have demonstrated that cracking due to shrinkage involved during the elimination of solvents and organic matter and densification of the remaining oxide is not a problem as long as the resulting oxide film is < {approx} 0.15 {micro}m in thickness. We have also shown that we can make thicker films by making multiple depositions if the substrate is smooth (roughness {le} 0.1 {micro}m) and contains no surface pores > 0.2 {micro}m. The penetration of the polymer into the porous substrate can be minimized by increasing the viscosity of the polymer and reducing the largest pore at the surface of the substrate to {le} 0.2 {micro}m. We have shown that this can be done, but we have also shown that it is difficult to make dense films that are defect free with areas > 1 cm{sup 2}. This is because of the roughness of the substrate and the difficulty in making a substrate which does not have surface voids > 0.2 {micro}m. Thus the process works well for dense, smooth substrates for films < 1 {micro}m thick, but is difficult to apply to rough, porous surfaces and to make film thickness > 1 {micro}m. As a result of these problems, we have been addressing the issue of how to make dense films in the thickness range of 1 to 5 {micro}m on sintered porous substrates without introducing cracks and holes due to shrinkage and surface voids? These

  7. Highly-enhanced reflow characteristics of sputter deposited Cu interconnections of large scale integrated devices by optimizing sputtering conditions

    Science.gov (United States)

    Onishi, Takashi; Mizuno, Masao; Yoshikawa, Tetsuya; Munemasa, Jun; Mizuno, Masataka; Kihara, Teruo; Araki, Hideki; Shirai, Yasuharu

    2013-07-01

    Improving the reflow characteristics of sputtered Cu films was attempted by optimizing the sputtering conditions. The reflow characteristics of films deposited under various sputtering conditions were evaluated by measuring their filling level in via holes. It was found that the reflow characteristics of the Cu films are strongly influenced by the deposition parameters. Deposition at low temperatures and the addition of H2 or N2 to the Ar sputtering gas had a significant influence on the reflow characteristics. Imperfections in the Cu films before and after the high-temperature, high-pressure treatments were investigated by positron annihilation spectroscopy. The results showed that low temperature and the addition of H2 or N2 led to films containing a large number of mono-vacancies, which accelerate atomic diffusion creep and dislocation core diffusion creep, improving the reflow characteristics of the Cu films.

  8. Coating for lithium anode, thionyl chloride active cathode electrochemical cell

    Energy Technology Data Exchange (ETDEWEB)

    Catanzarite, V.O.

    1983-01-04

    Electrochemical power cells having a cathode current collector, a combination liquid active cathode depolarizer electrolyte solvent and an anode that forms surface compounds when in intimate contact with the liquid cathode are enhanced by the addition of a passivation limiting film contiguous to said anode. The passivating film is a member of the cyanoacrilate family of organic compounds.

  9. Coating for lithium anode, thionyl chloride active cathode electrochemical cell

    Energy Technology Data Exchange (ETDEWEB)

    Catanzarite, V.O.

    1981-10-20

    Electrochemical power cells having a cathode current collector, a combination liquid active cathode depolarizer electrolyte solvent and an anode that forms surface compounds when in intimate contact with the liquid cathode are enhanced by the addition of a passivation limiting film contiguous to said anode. The passivating film is a member of the cyanoacrilate family of organic compounds.

  10. Effect of process parameters on coating composition of cathodic ...

    Indian Academy of Sciences (India)

    cathodic treatments [3]. For the anodic plasma process, sur- face passivation of the working electrode can lead to the growth of oxide film and it can be named micro-arc oxida- tion (MAO) or plasma electrolytic oxidation (PEO) [4]. On the other hand, when the substrate is cathodically polarized. (cathodic plasma electrolysis, ...

  11. Cold cathodes on ultra-dispersed diamond base

    International Nuclear Information System (INIS)

    Alimova, A.N.; Zhirnov, V.V.; Chubun, N.N.; Belobrov, P.I.

    1998-01-01

    Prospects of application of nano diamond powders for fabrication of cold cathodes are discussed.Cold cathodes based on silicon pointed structures with nano diamond coatings were prepared.The deposition technique of diamond coating was dielectrophoresis from suspension of nano diamond powder in organic liquids.The cathodes were tested in sealed prototypes of vacuum electronic devices

  12. Zn{sub x}Zr{sub y}O{sub z} thin films grown by DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, O. [Instituto de Ciencia de Materiales de Madrid (CSIC), Madrid (Spain); Hernandez-Velez, M. [Departamento de Fisica Aplicada, Universidad Autonoma de Madrid (Spain)

    2017-10-15

    The structural and optical properties of thin films deposited by DC reactive magnetron co-sputtering using Zn and Zr targets in argon and oxygen gas mixtures at room temperature are reported. The power applied to the Zr cathode was kept constant, while that applied to the Zn cathode was varied between 0 and 150 W to produce very different Zn{sub x}Zr{sub y}O{sub z} ternary compounds with Zn/Zr atomic ratios in the range of 0.1-10. The composition, crystalline structure, and optical properties of the samples were determined by EDX, XRD, FTIR, and UV-visible spectroscopies. The grown films are polycrystalline, and the preferred crystallographic orientation depends on the Zn atomic concentration in the film. The optical transmission in the UV-visible range is approximately 80% in all cases, and as the Zn atomic content increases, the absorption edge shifts to longer wavelengths. The optical band gap, E{sub g}, shifted from 5.5 to 3.5 eV when the Zn/Zr atomic ratio was increased. The results indicate the potential use of these materials in optoelectronic applications. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  13. Cathode follower RF system with frequency modulation

    International Nuclear Information System (INIS)

    Irie, Y.; Yano, Y.; Kaneko, N.; Kobayashi, Y.

    1994-01-01

    A model RF system with a cathode follower was tested under frequency modulation in the 1-3.5 MHz range. The repetition rate was 40 Hz. The oscillation was stable, and the output impedance was measured to be around 20 ohm. (author)

  14. Renovation of the cathodic protection system

    NARCIS (Netherlands)

    Schuten, G.; Leggedoor, J.; Polder, R.B.; Peelen, W.H.A.

    2003-01-01

    The first system for Cathodic Protection of concrete in the Netherlands was applied to a one bicycle lane of a bridge suffering corrosion due to de-icing salt penetration in 1986. This CP system was based on the Ferex 100S conducting polymer cable anode in a cementitious overlay. Its functioning was

  15. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  16. Improved Rare-Earth Emitter Hollow Cathode

    Science.gov (United States)

    Goebel, Dan M.

    2011-01-01

    An improvement has been made to the design of the hollow cathode geometry that was created for the rare-earth electron emitter described in Compact Rare Earth Emitter Hollow Cathode (NPO-44923), NASA Tech Briefs, Vol. 34, No. 3 (March 2010), p. 52. The original interior assembly was made entirely of graphite in order to be compatible with the LaB6 material, which cannot be touched by metals during operation due to boron diffusion causing embrittlement issues in high-temperature refractory materials. Also, the graphite tube was difficult to machine and was subject to vibration-induced fracturing. This innovation replaces the graphite tube with one made out of refractory metal that is relatively easy to manufacture. The cathode support tube is made of molybdenum or molybdenum-rhenium. This material is easily gun-bored to near the tolerances required, and finish machined with steps at each end that capture the orifice plate and the mounting flange. This provides the manufacturability and robustness needed for flight applications, and eliminates the need for expensive e-beam welding used in prior cathodes. The LaB6 insert is protected from direct contact with the refractory metal tube by thin, graphite sleeves in a cup-arrangement around the ends of the insert. The sleeves, insert, and orifice plate are held in place by a ceramic spacer and tungsten spring inserted inside the tube. To heat the cathode, an insulating tube is slipped around the refractory metal hollow tube, which can be made of high-temperature materials like boron nitride or aluminum nitride. A screw-shaped slot, or series of slots, is machined in the outside of the ceramic tube to constrain a refractory metal wire wound inside the slot that is used as the heater. The screw slot can hold a single heater wire that is then connected to the front of the cathode tube by tack-welding to complete the electrical circuit, or it can be a double slot that takes a bifilar wound heater with both leads coming out

  17. Estimation of Sputtering Damages on a Magnetron H- Ion Source Induced by Cs+ and H+ Ions

    CERN Document Server

    Pereira, H; Alessi, J; Kalvas, t

    2013-01-01

    An H− ion source is being developed for CERN’s Linac4 accelerator. A beam current requirement of 80 mA and a reliability above 99% during 1 year with 3 month uninterrupted operation periods are mandatory. To design a low-maintenance long life-time source, it is important to investigate and understand the wear mechanisms. A cesiated plasma discharge ion source, such as the BNL magnetron source, is a good candidate for the Linac4 ion source. However, in the magnetron source operated at BNL, the removal of material from the molybdenum cathode and the stainless steel anode cover plate surfaces is visible after extended operation periods. The observed sputtering traces are shown to result from cesium vapors and hydrogen gas ionized in the extraction region and subsequently accelerated by the extraction field. This paper presents a quantitative estimate of the ionization of cesium and hydrogen by the electron and H− beams in the extraction region of BNL’s magnetron ion source. The respective contributions o...

  18. On the structural and optical properties of sputtered hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    Barhdadi, A.; Chafik El ldrissi, M.

    2002-08-01

    The present work is essentially focused on the study of optical and structural properties of hydrogenated amorphous silicon thin films (a-Si:H) prepared by radio-frequency cathodic sputtering. We examine separately the influence of hydrogen partial pressure during film deposition, and the effect of post-deposition thermal annealings on the main optical characteristics of the layers such as refraction index, optical gap and Urbach energy. Using the grazing X-rays reflectometry technique, thin film structural properties are examined immediately after films deposition as well as after surface oxidation or annealing. We show that low hydrogen pressures allow a saturation of dangling bonds in the layers, while high doses lead to the creation of new defects. We show also that thermal annealing under moderate temperatures improves the structural quality of the deposited layers. For the films examined just after deposition, the role of hydrogen appears in the increase of their density. For those analysed after a short stay in the ambient, hydrogen plays a protective role against the oxidation of their surfaces. This role disappears for a long time stay in the ambient. (author)

  19. Plasma analysis of inductively coupled impulse sputtering of Cu, Ti and Ni

    Science.gov (United States)

    Loch, D. A. L.; Aranda Gonzalvo, Y.; Ehiasarian, A. P.

    2017-06-01

    Inductively coupled impulse sputtering (ICIS) is a new development in the field of highly ionised pulsed PVD processes. For ICIS the plasma is generated by an internal inductive coil, replacing the need for a magnetron. To understand the plasma properties, measurements of the current and voltage waveforms at the cathode were conducted. The ion energy distribution functions (IEDFs) were measured by energy resolved MS and plasma chemistry was analysed by OES and then compared to a model. The target was operated in pulsed DC mode and the coil was energised by pulsed RF power, with a duty cycle of 7.5%. At a constant pressure (14 Pa) the set peak RF power was varied from 1000-4000 W. The DC voltage to the target was kept constant at 1900 V. OES measurements have shown a monotonic increase in intensity with increasing power. Excitation and ionisation processes were single step for ICIS of Ti and Ni and multi-step for Cu. The latter exhibited an unexpectedly steep rise in ionisation efficiency with power. The IEDFs measured by MS show the material- and time-dependant plasma potential in the range of 10-30 eV, ideal for increased surface mobility without inducing lattice defects. A lower intensity peak, of high energetic ions, is visible at 170 eV during the pulse.

  20. Thick beryllium coatings by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Wu, H; Nikroo, A; Youngblood, K; Moreno, K; Wu, D; Fuller, T; Alford, C; Hayes, J; Detor, A; Wong, M; Hamza, A; van Buuren, T; Chason, E

    2011-04-14

    Thick (>150 {micro}m) beryllium coatings are studied as an ablator material of interest for fusion fuel capsules for the National Ignition Facility (NIF). As an added complication, the coatings are deposited on mm-scale spherical substrates, as opposed to flats. DC magnetron sputtering is used because of the relative controllability of the processing temperature and energy of the deposits. We used ultra small angle x-ray spectroscopy (USAXS) to characterize the void fraction and distribution along the spherical surface. We investigated the void structure using a combination focused ion beam (FIB) and scanning electron microscope (SEM), along with transmission electron microscopy (TEM). Our results show a few volume percent of voids and a typical void diameter of less than two hundred nanometers. Understanding how the stresses in the deposited material develop with thickness is important so that we can minimize film cracking and delamination. To that end, an in-situ multiple optical beam stress sensor (MOSS) was used to measure the stress behavior of thick Beryllium coatings on flat substrates as the material was being deposited. We will show how the film stress saturates with thickness and changes with pressure.

  1. Pressureless Bonding Using Sputtered Ag Thin Films

    Science.gov (United States)

    Oh, Chulmin; Nagao, Shijo; Suganuma, Katsuaki

    2014-12-01

    To improve the performance and reliability of power electronic devices, particularly those built around next-generation wide-bandgap semiconductors such as SiC and GaN, the bonding method used for packaging must change from soldering to solderless technology. Because traditional solders are problematic in the harsh operating conditions expected for emerging high-temperature power devices, we propose a new bonding method in this paper, namely a pressureless, low-temperature bonding process in air, using abnormal grain growth on sputtered Ag thin films to realize extremely high temperature resistance. To investigate the mechanisms of this bonding process, we characterized the microstructural changes in the Ag films over various bonding temperatures and times. We measured the bonding properties of the specimens by a die-shear strength test, as well as by x-ray diffraction measurements of the residual stress in the Ag films to show how the microstructural developments were essential to the bonding technology. Sound bonds with high die strength can be achieved only with abnormal grain growth at optimum bonding temperature and time. Pressureless bonding allows for production of reliable high-temperature power devices for a wide variety of industrial, energy, and environmental applications.

  2. Properties of gold nanostructures sputtered on glass

    Directory of Open Access Journals (Sweden)

    Kolská Zdeňka

    2011-01-01

    Full Text Available Abstract We studied the electrical and optical properties, density, and crystalline structure of Au nanostructures prepared by direct current sputtering on glass. We measured temperature dependence of sheet resistance and current-voltage characteristics and also performed scanning electron microscopy [SEM] analysis of gold nanolayers. It was shown that within the wide range of temperatures, gold nanolayers (<10 nm exhibit both metal and semiconducting-like type of conductivity. UV/Vis analysis proved the semiconducting characteristic of intrinsic Au clusters. SEM analysis showed the initiatory stadium of gold layer formation to be running over isolated islands. Gold density calculated from the weight and effective thickness of the layers is an increasing function of the layer thickness up to approximately 100 nm. In thin layers deposited on solid surface, a lattice expansion is observed, which is manifested in the increase of the lattice parameter and the decrease of metal density. With increasing layer thickness, the lattice parameter and the density approach the bulk values.

  3. Sputtered Layered Synthetic Microstruture (LSM) Dispersion Elements

    Science.gov (United States)

    Barbee, Troy W.

    1981-10-01

    The opportunities offered by engineered synthetic multilayer dispersion elements for x-rays have been recognized since the earliest days of x-ray diffraction analysis. In this paper, application of sputter deposition tehnology to the synthesis of Layered Synthetic Microstructure (LSM's) of sufficient quality or use as x-ray dispersion elements is discussed. It will be shown that high efficiency, controllble bandwidth dispersion elements, with d spacings varying from 15 Å to 180 Å, may be synthesized onto both mechanically stiff and flexible substrtes. Multilayer component materials include tungten, niobium, molybdenum, titanium, vanadium, and silicon layers separated by carbon layers. Experimental observations of peak reflectivity in first order, integrated reflectivity in first order, and diffraction performance at selected photon energies in the range, 100 to 15000 eV, will be reported and compared to theory. Emphasis is placed on results giving information concerning limiting structural characteristics of these LSM's. It will be shown that the observed behavior is in accord with theory, both kinematic and dynamic regimes being clearly observed. In addition, the mosaic spread of these LSM's is not detectable, indicatig that they are perfect structures. A consistent explanation of these experimental results indicates that roughness at the interfaces between constituent layers is the structural characteristic currently limiting diffracting behavior.

  4. Preparation and characterization of SOFC cathode films

    International Nuclear Information System (INIS)

    Baque, L; Serquis, A; Grunbaum, N; Prado, F; Caneiro, A

    2005-01-01

    Solid Oxide Fuel Cells (SOFC) are being widely studied due to their possible utilization to produce electrical energy in a wide power range (from 1 kW up to few hundreds of kW).The principle of operation of this kind of fuel cells involves reduction of O 2 in the cathode oxygen ions (O 2- ) diffusion of oxygen through the electrolyte and fuel oxidation in the anode.Commercial SOFC must work at temperature higher than to 1000 degree C to enable the O 2- diffusion.Therefore, it is necessary to investigate new materials that enable to decrease the operation temperature, improving SOFC performance and cost. La 1 -xSr x Co 1 -yFe y O 3 -δ (LSCF) perovskites are good candidates for SOFC cathodes because these materials present high ionic and electronic conductivity. LSCF cathodes are adequate to fabricate Ce 1 -xGd x O 2 -δ electrolyte SOFC due to its low chemical reactivity with this material and its similar thermal expansion coefficient. In this work we present a study of microstructural and electrochemical characteristics of films for SOFC cathodes. La 0 .4Sr 0 .6Co 0 .8Fe 0 .2O 3 -δ compounds were prepared by the acetate reaction method.Then, cathodes were deposited onto a Ce 0 .9Gd 0 .1O 2 -δ electrolyte disk by dip coating and spray techniques.Structural characterization is made by X-ray diffraction XRD and scanning electron microscopy (SEM).Electrochemical properties are characterized by complex impedance measurements.Finally, the relation between structural characteristics and electrical properties is discussed

  5. Cathode Composition in a Saltwater Metal-Air Battery

    Directory of Open Access Journals (Sweden)

    William Shen

    2017-01-01

    Full Text Available Metal-air batteries consist of a solid metal anode and an oxygen cathode of ambient air, typically separated by an aqueous electrolyte. Here, simple saltwater-based models of aluminum-air and zinc-air cells are used to determine the differences between theoretical cell electric potentials and experimental electric potentials. A substantial difference is observed. It is also found that the metal cathode material is crucial to cell electric potential, despite the cathode not participating in the net reaction. Finally, the material composition of the cathode appears to have a more significant impact on cell potential than the submerged surface area of the cathode.

  6. Progress of air-breathing cathode in microbial fuel cells

    Science.gov (United States)

    Wang, Zejie; Mahadevan, Gurumurthy Dummi; Wu, Yicheng; Zhao, Feng

    2017-07-01

    Microbial fuel cell (MFC) is an emerging technology to produce green energy and vanquish the effects of environmental contaminants. Cathodic reactions are vital for high electrical power density generated from MFCs. Recently tremendous attentions were paid towards developing high performance air-breathing cathodes. A typical air-breathing cathode comprises of electrode substrate, catalyst layer, and air-diffusion layer. Prior researches demonstrated that each component influenced the performance of air-breathing cathode MFCs. This review summarized the progress in development of the individual component and elaborated main factors to the performance of air-breathing cathode.

  7. Polymer coatings as separator layers for microbial fuel cell cathodes

    KAUST Repository

    Watson, Valerie J.

    2011-03-01

    Membrane separators reduce oxygen flux from the cathode into the anolyte in microbial fuel cells (MFCs), but water accumulation and pH gradients between the separator and cathode reduces performance. Air cathodes were spray-coated (water-facing side) with anion exchange, cation exchange, and neutral polymer coatings of different thicknesses to incorporate the separator into the cathode. The anion exchange polymer coating resulted in greater power density (1167 ± 135 mW m-2) than a cation exchange coating (439 ± 2 mW m-2). This power output was similar to that produced by a Nafion-coated cathode (1114 ± 174 mW m-2), and slightly lower than the uncoated cathode (1384 ± 82 mW m-2). Thicker coatings reduced oxygen diffusion into the electrolyte and increased coulombic efficiency (CE = 56-64%) relative to an uncoated cathode (29 ± 8%), but decreased power production (255-574 mW m-2). Electrochemical characterization of the cathodes ex situ to the MFC showed that the cathodes with the lowest charge transfer resistance and the highest oxygen reduction activity produced the most power in MFC tests. The results on hydrophilic cathode separator layers revealed a trade off between power and CE. Cathodes coated with a thin coating of anion exchange polymer show promise for controlling oxygen transfer while minimally affecting power production. © 2010 Elsevier B.V. All rights reserved.

  8. Cathode R&D for Future Light Sources

    Energy Technology Data Exchange (ETDEWEB)

    Dowell, D.H.; /SLAC; Bazarov, I.; Dunham, B.; /Cornell U., CLASSE; Harkay, K.; /Argonne; Hernandez-Garcia; /Jefferson Lab; Legg, R.; /Wisconsin U., SRC; Padmore, H.; /LBL, Berkeley; Rao, T.; Smedley, J.; /Brookhaven; Wan, W.; /LBL, Berkeley

    2010-05-26

    This paper reviews the requirements and current status of cathodes for accelerator applications, and proposes a research and development plan for advancing cathode technology. Accelerator cathodes need to have long operational lifetimes and produce electron beams with a very low emittance. The two principal emission processes to be considered are thermionic and photoemission with the photocathodes being further subdivided into metal and semi-conductors. Field emission cathodes are not included in this analysis. The thermal emittance is derived and the formulas used to compare the various cathode materials. To date, there is no cathode which provides all the requirements needed for the proposed future light sources. Therefore a three part research plan is described to develop cathodes for these future light source applications.

  9. Emission mechanism in high current hollow cathode arcs

    International Nuclear Information System (INIS)

    Krishnan, M.

    1976-01-01

    Large (2 cm-diameter) hollow cathodes have been operated in a magnetoplasmadynamic (MPD) arc over wide ranges of current (0.25 to 17 kA) and mass flow (10 -3 to 8 g/sec), with orifice current densities and mass fluxes encompassing those encountered in low current steady-state hollow cathode arcs. Detailed cathode interior measurements of current and potential distributions show that maximum current penetration into the cathode is about one diameter axially upstream from the tip, with peak inner surface current attachment up to one cathode diameter upstream of the tip. The spontaneous attachment of peak current upstream of the cathode tip is suggested as a criterion for characteristic hollow cathode operation. This empirical criterion is verified by experiment

  10. The corrosion and passivity of sputtered Mg–Ti alloys

    International Nuclear Information System (INIS)

    Song, Guang-Ling; Unocic, Kinga A.; Meyer, Harry; Cakmak, Ercan; Brady, Michael P.; Gannon, Paul E.; Himmer, Phil; Andrews, Quinn

    2016-01-01

    Highlights: • A supersaturated single phase Mg–Ti alloy can be obtained by magnetron sputtering. • The anodic dissolution of Mg–Ti alloy is inhibited by Ti addition. • The alloy becomes passive when Ti content is high and the alloy has become Ti based. • The formation of a continuous thin passive film is responsible for the passivation of the alloy. - Abstract: This study explored the possibility of forming a “stainless” Mg–Ti alloy. The electrochemical behavior of magnetron-sputtered Mg–Ti alloys was measured in a NaCl solution, and the surface films on the alloys were examined by XPS, SEM and TEM. Increased corrosion resistance was observed with increased Ti content in the sputtered Mg–Ti alloys, but passive-like behavior was not reached until the Ti level (atomic %) was higher than the Mg level. The surface film that formed on sputtered Mg–Ti based alloys in NaCl solution was thick, discontinuous and non-protective, whereas a thin, continuous and protective Mg and Ti oxide film was formed on a sputtered Ti–Mg based alloy.

  11. Simple model of surface roughness for binary collision sputtering simulations

    Science.gov (United States)

    Lindsey, Sloan J.; Hobler, Gerhard; Maciążek, Dawid; Postawa, Zbigniew

    2017-02-01

    It has been shown that surface roughness can strongly influence the sputtering yield - especially at glancing incidence angles where the inclusion of surface roughness leads to an increase in sputtering yields. In this work, we propose a simple one-parameter model (the "density gradient model") which imitates surface roughness effects. In the model, the target's atomic density is assumed to vary linearly between the actual material density and zero. The layer width is the sole model parameter. The model has been implemented in the binary collision simulator IMSIL and has been evaluated against various geometric surface models for 5 keV Ga ions impinging an amorphous Si target. To aid the construction of a realistic rough surface topography, we have performed MD simulations of sequential 5 keV Ga impacts on an initially crystalline Si target. We show that our new model effectively reproduces the sputtering yield, with only minor variations in the energy and angular distributions of sputtered particles. The success of the density gradient model is attributed to a reduction of the reflection coefficient - leading to increased sputtering yields, similar in effect to surface roughness.

  12. Erosion behavior of composite Al-Cr cathodes in cathodic arc plasmas in inert and reactive atmospheres

    International Nuclear Information System (INIS)

    Franz, Robert; Mendez Martin, Francisca; Hawranek, Gerhard; Polcik, Peter

    2016-01-01

    Al x Cr 1−x composite cathodes with Al contents of x = 0.75, 0.5, and 0.25 were exposed to cathodic arc plasmas in Ar, N 2 , and O 2 atmospheres and their erosion behavior was studied. Cross-sectional analysis of the elemental distribution of the near-surface zone in the cathodes by scanning electron microscopy revealed the formation of a modified layer for all cathodes and atmospheres. Due to intermixing of Al and Cr in the heat-affected zone, intermetallic Al-Cr phases formed as evidenced by x-ray diffraction analysis. Cathode poisoning effects in the reactive N 2 and O 2 atmospheres were nonuniform as a result of the applied magnetic field configuration. With the exception of oxide islands on Al-rich cathodes, reactive layers were absent in the circular erosion zone, while nitrides and oxides formed in the less eroded center region of the cathodes

  13. Improvement of the cavitation erosion resistance for Cr3Si film on stainless steel by double cathode glow discharge

    Science.gov (United States)

    Ding, Hongqin; Qiu, Yujiang

    2017-04-01

    In this study, sputter-deposited Cr3Si film was prepared by double cathode glow discharge (DCGD) technique onto 304 stainless steel. The phase constituents, surface microstructure and chemical compositions of the film were examined by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). After the DCGD process, the hardness of Cr3Si film was 26 GPa, about 10 times of the stainless steel, 2.5 GPa. The cavitation erosion resistance of Cr3Si film and stainless steel were investigated by using an ultrasonic vibration cavitation erosion system. After 30 hours of cavitation tests, the cumulative mass loss of Cr3Si film was only 60% of the stainless steel. Compared with the untreated stainless steel, the cavitation erosion resistance of Cr3Si film was improved. The cavitation mechanism of Cr3Si film is due to the delamination and spalling of local surface layer derived from its inherent brittleness.

  14. A new class of amorphous cathode active material LixMyPOz (M = Ni, Cu, Co, Mn, Au, Ag, Pd)

    Science.gov (United States)

    Sabi, Yuichi; Sato, Susumu; Hayashi, Saori; Furuya, Tatsuya; Kusanagi, Susumu

    2014-07-01

    A new class of amorphous cathode active material LixMyPOz (LiMPO) is proposed. The materials are sputter deposited to thin film form by Li3PO4 together with metal or metal oxide targets. Among several materials tested as thin-film battery, working material found are M = Ni, Cu, Co, Mn, Au, Ag, Pd. The property is intensively studied for LixCuyPOz (LiCuPO) and LixNiyPOz (LiNiPO). Those materials shows wide composition margin such as composition y between 1 and 3, and high capacity for LiNiPO with maximum value of 330 mAh g-1. The capability to charge and discharge at high rate is shown up to 30 C. This preliminary report reveals its high potentiality for further optimization.

  15. New discharge tube with virtual cathode

    International Nuclear Information System (INIS)

    Seidelmann, L.; Aubrecht, L.

    2003-01-01

    Till this time known methods of the excitation of the discharge between electrodes are using either secondary or thermo emission of electrons by the cathode. Usually we speak about the self-maintained discharge. Lifetime of the cathode, that is shortened by the emission, limits in principle, the lifetime of the whole discharge tube. The discharge can, according to the present state of the art, be induced also by the inductive way. Arrangement for excitation of such discharge is rather expensive. The construction of the inductive excited discharge tube is considerably influenced by the necessity of the limitation of the losses in excitation magnetic circuits. Especially length of the discharge and pressure of the working gas are limited by the economic standpoints. Function of the discharge is always connected with unwanted electromagnetic radiation, whose restraint is expensive and represents limiting factor for arrangement of the discharge tube (Authors)

  16. Impedance studies on Li-ion cathodes

    Energy Technology Data Exchange (ETDEWEB)

    NAGASUBRAMANIAN, GANESAN

    2000-04-17

    This paper describes the author's 2- and 3-electrode impedance results of metal oxide cathodes. These results were extracted from impedance data on 18650 Li-ion cells. The impedance results indicate that the ohmic resistance of the cell is very nearly constant with state-of-charge (SOC) and temperature. For example, the ohmic resistance of 18650 Li-ion cells is around 60 m{Omega} for different SOCS (4.1V to 3.0V) and temperatures from 35 C to {minus}20 C. However, the interfacial impedance shows a modest increase with SOC and a huge increase of between 10 and 100 times with decreasing temperature. For example, in the temperature regime (35 C down to {minus}20 C) the overall cell impedance has increased from nearly 200 m{Omega} to 8,000 m{Omega}. Most of the increase in cell impedance comes from the metal oxide cathode/electrolyte interface.

  17. Cathode readout with stripped resistive drift tubes

    International Nuclear Information System (INIS)

    Bychkov, V.N.; Kekelidze, G.D.; Novikov, E.A.; Peshekhonov, V.D.; Shafranov, M.D.; Zhiltsov, V.E.

    1995-01-01

    A straw tube drift chamber prototype has been constructed and tested. The straw tube material is mylar film covered with a carbon layer with a resistivity of 0.5, 30 and 70 kΩ/□. Both the anode wire and the cathode strip signals were detected to study the behaviour of the chamber in the presence of X-ray ionization. The construction and the results of the study are presented. (orig.)

  18. Barium Depletion in Hollow Cathode Emitters

    Science.gov (United States)

    Polk, James E.; Capece, Angela M.; Mikellides, Ioannis G.; Katz, Ira

    2009-01-01

    The effect of tungsten erosion, transport and redeposition on the operation of dispenser hollow cathodes was investigated in detailed examinations of the discharge cathode inserts from an 8200 hour and a 30,352 hour ion engine wear test. Erosion and subsequent re-deposition of tungsten in the electron emission zone at the downstream end of the insert reduces the porosity of the tungsten matrix, preventing the ow of barium from the interior. This inhibits the interfacial reactions of the barium-calcium-aluminate impregnant with the tungsten in the pores. A numerical model of barium transport in the internal xenon discharge plasma shows that the barium required to reduce the work function in the emission zone can be supplied from upstream through the gas phase. Barium that flows out of the pores of the tungsten insert is rapidly ionized in the xenon discharge and pushed back to the emitter surface by the electric field and drag from the xenon ion flow. This barium ion flux is sufficient to maintain a barium surface coverage at the downstream end greater than 0.6, even if local barium production at that point is inhibited by tungsten deposits. The model also shows that the neutral barium pressure exceeds the equilibrium vapor pressure of the impregnant decomposition reaction over much of the insert length, so the reactions are suppressed. Only a small region upstream of the zone blocked by tungsten deposits is active and supplies the required barium. These results indicate that hollow cathode failure models based on barium depletion rates in vacuum dispenser cathodes are very conservative.

  19. Photovoltaic powered regulated cathodic protection system

    Energy Technology Data Exchange (ETDEWEB)

    Anis, W.R.; Alfons, H.A. (Ain Shams Univ., Cairo (Egypt))

    1994-08-01

    The cathodic protection (CP) system objective is to protect metallic structures against corrosion caused by chemical reaction between metallic structures and surrounding mediums, such as soil or water. To overcome such a problem, a sacrificing anode is connected to the protected structure (which acts as a cathode) through a DC power supply. As a result, a current passes from the sacrificing anode to the protected cathode. This leads to anode corrosion rather than causing the cathode (protected structure) corrosion. To stop the corrosion, the protected structure requires a constant current determined by structure metal, area, and the surrounding medium. The major difficulty in achieving this condition is the variation of surrounding medium resistivity due to climatic condition changes. For example, rains as well as humidity decrease soil resistivity, and as a result the DC current increases and a harmful overprotection may take place. Both corrosion and overprotection are harmful for the metallic structure. Conventional CP systems resolve this problem by manual adjustment of DC voltage periodically to obtain a constant current. Such adjustment depends on the personal experience of the technician and the accuracy of the measuring equipment used. Accordingly, the adjustment is subject to personal and measuring equipment errors. Moreover, if the internal between two successive adjustment is relatively long, structure corrosion becomes significant, which may have drastic consequences. To overcome the aforementioned difficulties associated with the conventional CP system, an automatically regulated CP system is discussed in this article. The proposed system senses the variations of the surrounding medium resistivity and adjusts the DC voltage of the system automatically so that the DC current is kept constant at the required level. The design of a solar photovoltaic system to supply the CP system by the required DC power is also discussed.

  20. Aluminum ion batteries: electrolytes and cathodes

    OpenAIRE

    Reed, Luke

    2015-01-01

    Great abundance, trivalent oxidation state, high volumetric energy density and inherent safety make aluminum a desirable source of power. Attempts to use aluminum as an electrochemical energy source have been made since the 1800s. To date no great success has been achieved due to difficulties with finding a suitable electrolyte and cathode material. This dissertation explains some of the author’s efforts to overcome these difficulties.Chapter two reports the results of an investigation of an ...

  1. Bi-metallic nanoparticles as cathode electrocatalysts

    Energy Technology Data Exchange (ETDEWEB)

    Lu, Jun; Amine, Khalil; Wang, Xiaoping; Luo, Xiangyi; Myers, Deborah J.

    2018-03-27

    A lithium-air battery cathode catalyst includes core-shell nanoparticles on a carbon support, wherein: a core of the core-shell nanoparticles is platinum metal; and a shell of the core-shell nanoparticles is copper metal; wherein: the core-shell nanoparticles have a weight ratio of the copper metal to the platinum metal from about 4% to about 6% copper to from about 2% to about 12% platinum, with a remaining percentage being the carbon support.

  2. FUZZY LOGIC CONTROLLED CATHODIC PROTECTION CIRCUIT DESIGN

    OpenAIRE

    AKÇAYOL, M. Ali

    2010-01-01

    In this study, output voltage of automatic transformer-rectifier (TR) unit of impressed current cathodic protection has been controlled by using fuzzy logic controller. To prevent corrosion, voltage between the protection metal and the auxiliary anode has to be controlled on a desired level. Because soil resistance in the environment changes with humidity and soil characteristics, TRs must control the output voltage between protection metal and auxiliary anode automatically. In this study, a ...

  3. Significance of negative ion formation in sputtering and SIMS analysis

    International Nuclear Information System (INIS)

    Cuomo, J.J.; Gambino, R.J.; Harper, J.M.E.; Kuptsis, J.D.; Webber, J.C.

    1978-01-01

    An unexpected substrate etching phenomenon during the sputtering of certain intermetallic compounds has been found to be caused by a large flux of negative metal ions from the sputtering target. The substrates directly under the target in a diode geometry are etched (eroded) rather than coated with a film. The occurrence of this substrate etching has been correlated with negative ion yields measured by secondary ion mass spectroscopy (SIMS). We find a high yield of negative metal ions from several intermetallic compounds in addition to the highly ionic compounds previously reported. A model based on electron charge transfer is presented which predicts when negative ion formation will be important, and the dependence of etch rate on target voltage is also treated. We predict that negative ion effects will be found in the sputtering of a wide range of compounds

  4. Angular distributions of sputtered particles from NiTi alloy

    International Nuclear Information System (INIS)

    Neshev, I.; Hamishkeev, V.; Chernysh, V.S.; Postnikov, S.; Mamaev, B.

    1993-01-01

    The angular distributions of sputtered Ni and Ti from a polycrystalline NiTi (50-50%) alloy are investigated by Auger electron spectroscopy and Rutherford backscattering spectroscopy. A difference in the angular distributions is observed with Ni being sputtered preferentially near the surface normal. A computer program for the calculation of the angular distributions of constituents sputtered from binary targets is created and used. The mechanisms responsible for the observed differences in the angular distributions are discussed. It is found that the collisional cascade theory is not directly applicable to the results of the constituents' angular distributions obtained in the presence of oxygen. The fitted coefficients of bombardment-induced segregation are found to be greater than the experimentally obtained ones. (author)

  5. Recent advancements in sputter-type heavy negative ion sources

    International Nuclear Information System (INIS)

    Alton, G.D.

    1989-01-01

    Significant advancement have been made in sputter-type negative ion sources which utilize direct surface ionization, or a plasma to form the positive ion beam used to effect sputtering of samples containing the material of interest. Typically, such sources can be used to generate usable beam intensities of a few μA to several mA from all chemically active elements, depending on the particular source and the electron affinity of the element in question. The presentation will include an introduction to the fundamental processes underlying negative ion formation by sputtering from a low work function surface and several sources will be described which reflect the progress made in this technology. 21 refs., 9 figs., 1 tab

  6. A definitive criterion for cathodic protection

    Energy Technology Data Exchange (ETDEWEB)

    Alexander, Roger [Cathodic Protection Network International Ltd., Reading (United Kingdom)

    2009-07-01

    The corrosion reaction is defined using the Pourbaix Diagram and includes consideration of the pH, temperature, pressure, nobility of the metal and conductivity of the electrolyte. The passive zone can be established in a laboratory by creating a closed circuit condition in which the voltages can be measured. Natural corrosion cells occurring in simple conditions can be evaluated for the purpose of monitoring the performance of cathodic protection. Metal pipelines are complex networks of conductors submerged in electrolyte of infinitely variable qualities. The present method used to ascertain the effectiveness of cathodic protection has many inherent errors and results in costly and unpredictable corrosion failures. An electrode has been devised to define the exact electrical status of the corrosion reaction at its location. The design allows a closed circuit measurement of the corrosion current that can determine whether or not corrosion has been stopped by cathodic protection. This has allowed the development of software that can calculate the condition and corrosion status throughout a network of pipelines, using electrical circuit analysis common in the electronics industry. (author)

  7. Arc generation from sputtering plasma-dielectric inclusion interactions

    International Nuclear Information System (INIS)

    Wickersham, C.E. Jr.; Poole, J.E.; Fan, J.S.

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al 2 O 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect density, and the intensity of the optical emission from the arcing plasma indicates that the critical aluminum oxide inclusion area for arcing is 0.22±0.1 mm2 when the sputtering plasma sheath dark-space λ d , is 0.51 mm. Inclusions with areas greater than this critical value readily induce arcing and macroparticle ejection during sputtering. Inclusions below this critical size do not cause arcing or macroparticle ejection. When the inclusion major axis is longer than 2λ d and lies perpendicular to the sputter erosion track tangent, the arcing activity increases significantly over the case where the inclusion major axis lies parallel to the erosion track tangent

  8. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Zhaoying; Liu, Bingwen; Zhao, Evan; Jin, Ke; Du, Yingge; Neeway, James J.; Ryan, Joseph V.; Hu, Dehong; Zhang, Hongliang; Hong, Mina; Le Guernic, Solenne; Thevuthasan, Suntharampillai; Wang, Fuyi; Zhu, Zihua

    2015-08-01

    For the first time, the use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass, SON68, and layered hole-perovskite oxide thin films were selected as model systems due to their fundamental and practical significance. Our study shows that if the size of analysis areas is same, the highest sputter rate of argon cluster sputtering can be 2-3 times faster than the highest sputter rates of oxygen or cesium sputtering. More importantly, high quality data and high sputter rates can be achieved simultaneously for argon cluster sputtering while this is not the case for cesium and oxygen sputtering. Therefore, for deep depth profiling of insulating samples, the measurement efficiency of argon cluster sputtering can be about 6-15 times better than traditional cesium and oxygen sputtering. Moreover, for a SrTiO3/SrCrO3 bi-layer thin film on a SrTiO3 substrate, the true 18O/16O isotopic distribution at the interface is better revealed when using the argon cluster sputtering source. Therefore, the implementation of an argon cluster sputtering source can significantly improve the measurement efficiency of insulating materials, and thus can expand the application of ToF-SIMS to the study of glass corrosion, perovskite oxide thin films, and many other potential systems.

  9. Advances in sputtered and ion plated solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1985-01-01

    The glow discharge or ion assisted vacuum deposition techniques, primarily sputtering and ion plating, have rapidly emerged and offer great potential to deposit solid lubricants. The increased energizing of these deposition processes lead to improved adherence and coherence, favorable morphological growth, higher density, and reduced residual stresses in the film. These techniques are of invaluable importance where high precision machines tribo-components require very thin, uniform lubricating films (0.2 m), which do not interface with component tolerances. The performance of sputtered MoS2 films and ion plated Au and Pb films are described in terms of film thickness, coefficient of friction, and wear lives.

  10. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  11. Mechanical and structural properties of sputtered Ni/Ti multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Senthil Kumar, M.; Boeni, P.; Tixier, S.; Clemens, D.; Horisberger, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1997-09-01

    Ni/Ti bilayers have been prepared by dc-magnetron sputtering in order to study their mechanical and structural properties. A remarkable reduction of stress is observed when the Ni layers are sputtered reactively in argon with a high partial pressure of air. The high angle x-ray diffraction studies show a tendency towards amorphisation of the Ni layers with increasing air flow. The low angle measurements indicate a substantial reduction of interdiffusion resulting in smoother interfaces with increasing air content. (author) 2 figs., 2 refs.

  12. Nanoporous zinc oxide films prepared by magnetron sputtering

    International Nuclear Information System (INIS)

    Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.

    2011-01-01

    In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.

  13. X-ray photoelectron spectroscopy of nano-multilayered Zr-O/Al-O coatings deposited by cathodic vacuum arc plasma

    International Nuclear Information System (INIS)

    Zhitomirsky, V.N.; Kim, S.K.; Burstein, L.; Boxman, R.L.

    2010-01-01

    Nano-multilayered Zr-O/Al-O coatings with alternating Zr-O and Al-O layers having a bi-layer period of 6-7 nm and total coating thickness of 1.0-1.2 μm were deposited using a cathodic vacuum arc plasma process on rotating Si substrates. Plasmas generated from two cathodes, Zr and Al, were deposited simultaneously in a mixture of Ar and O 2 background gases. The Zr-O/Al-O coatings, as well as bulk ZrO 2 and Al 2 O 3 reference samples, were studied using X-ray photoelectron spectroscopy (XPS). The XPS spectra were analyzed on the surface and after sputtering with a 4 kV Ar + ion gun. High resolution angle resolved spectra were obtained at three take-off angles: 15 o , 45 o and 75 o relative to the sample surface. It was shown that preferential sputtering of oxygen took place during XPS of bulk reference ZrO 2 samples, producing ZrO and free Zr along with ZrO 2 in the XPS spectra. In contrast, no preferential sputtering was observed with Al 2 O 3 reference samples. The Zr-O/Al-O coatings contained a large amount of free metals along with their oxides. Free Zr and Al were observed in the coating spectra both before and after sputtering, and thus cannot be due solely to preferential sputtering. Transmission electron microscopy revealed that the Zr-O/Al-O coatings had a nano-multilayered structure with well distinguished alternating layers. However, both of the alternating layers of the coating contained of a mixture of aluminum and zirconium oxides and free Al and Zr metals. The concentration of Zr and Al changed periodically with distance normal to the coating surface: the Zr maximum coincided with the Al minimum and vice versa. However the concentration of Zr in both alternating layers was significantly larger than that of Al. Despite the large free metal concentration, the Knoop hardness, 21.5 GPa, was relatively high, which might be attributed to super-lattice formation or formation of a metal-oxide nanocomposite within the layers.

  14. Characterization of the Be-Ag interfacial region of silver films deposited onto beryllium using a hot hollow cathode discharge

    International Nuclear Information System (INIS)

    Larson, D.T.; Draper, H.L.

    1983-01-01

    Silver films are physically vapor deposited onto beryllium substrates using a hot hollow cathode discharge. To obtain high Be-Ag adhesion strengths, an atomically 'clean' surface is obtained by ion bombardment cleaning. In this investigation, the relationship of the ion cleaning parameters to contaminants in the Be-Ag interfacial region and their effect on adhesion strength were evaluated. Specimens were ion cleaned at various bombardment parameters and then flash coated with silver. In-depth film profiles were taken by sputter etching in argon and monitoring the Auger electron peak-to-peak heights. The interface was also analyzed by taking a complete spectrum at the edge of the sputter crater. Impurities found at the interface were tantalum, copper and oxygen. The results for adhesion strengths showed that a small amount of oxygen (about 2 at.%) left in the Be-Ag interface will reduce the adhesion strength of the coating. Silver films deposited in an air leak that was greater than a leak which is easily detectable by residual gas analysis contained only about 0.5 at.% O with no reduction in film adherence strengths. (Auth.)

  15. Optical properties of d.c. magneto sputtered tantalum and titanium ...

    Indian Academy of Sciences (India)

    Administrator

    Department of Physics, University of Rajasthan, Jaipur 302 004, India. MS received 19 April 2009; revised 20 May 2009. Abstract. ... Magnetron sputtering has become the process of choice for the deposition of wide range of important ... Sputtering unit with multiple targets. (a) View of sputtering unit with Argon cylinder and.

  16. Cathode power distribution system and method of using the same for power distribution

    Science.gov (United States)

    Williamson, Mark A; Wiedmeyer, Stanley G; Koehl, Eugene R; Bailey, James L; Willit, James L; Barnes, Laurel A; Blaskovitz, Robert J

    2014-11-11

    Embodiments include a cathode power distribution system and/or method of using the same for power distribution. The cathode power distribution system includes a plurality of cathode assemblies. Each cathode assembly of the plurality of cathode assemblies includes a plurality of cathode rods. The system also includes a plurality of bus bars configured to distribute current to each of the plurality of cathode assemblies. The plurality of bus bars include a first bus bar configured to distribute the current to first ends of the plurality of cathode assemblies and a second bus bar configured to distribute the current to second ends of the plurality of cathode assemblies.

  17. Cathodic corrosion: Part 2. Properties of nanoparticles synthesized by cathodic corrosion

    International Nuclear Information System (INIS)

    Yanson, A.I.; Yanson, Yu.I.

    2013-01-01

    We demonstrate how cathodic corrosion in concentrated aqueous solutions enables one to prepare nanoparticles of various metals and metal alloys. Using various characterization methods we show that the composition of nanoparticles remains that of the starting material, and the resulting size distribution remains rather narrow. For the case of platinum we show how the size and possibly even the shape of the nanoparticles can be easily controlled by the parameters of corrosion. Finally, we discuss the advantages of using the nanoparticles prepared by cathodic corrosion for applications in (electro-)catalysis.

  18. Preliminary experimental study of a carbon fiber array cathode

    Science.gov (United States)

    Li, An-kun; Fan, Yu-wei

    2016-08-01

    The preliminary experimental results of a carbon fiber array cathode for the magnetically insulated transmission line oscillator (MILO) operations are reported. When the diode voltage and diode current were 480 kV and 44 kA, respectively, high-power microwaves with a peak power of about 3 GW and a pulse duration of about 60 ns were obtained in a MILO device with the carbon fiber array cathode. The preliminary experimental results show that the shot-to-shot reproducibility of the diode current and the microwave power is stable until 700 shots. No obvious damage or deterioration can be observed in the carbon fiber surface morphology after 700 shots. Moreover, the cathode performance has no observable deterioration after 700 shots. In conclusion, the maintain-free lifetime of the carbon fiber array cathode is more than 700 shots. In this way, this carbon fiber array cathode offers a potential replacement for the existing velvet cathode.

  19. Field application of cathodic prevention on reinforced concrete structures

    Energy Technology Data Exchange (ETDEWEB)

    Bazzoni, A.; Bazzoni, B.; Lazzari, L. [Cescor srl, Milano (Italy); Bertolini, L.; Pedeferri, P. [Politecnico di Milano (Italy). Dept. di Chimica Fisica Applicata

    1996-11-01

    This paper illustrates the results gained during the first three years of cathodic protection application to Frejus highway viaducts in northern Italy. CP applications deal with corrosion control of chloride contaminated structures (cathodic protection application properly said) and the corrosion prevention of new non-contaminated structures, constructed with incorporated cathodic protection systems (so-called cathodic prevention). Both normal and post-tensioned structures are present: in the latter case the problems connected with the risk of hydrogen embrittlement of the tendons are discussed. The paper illustrates also the computerized system for gathering and monitoring data and the criteria adopted to evaluate and control the cathodic protection and cathodic prevention conditions as well as to avoid overprotection.

  20. Scanning optical pyrometer for measuring temperatures in hollow cathodes.

    Science.gov (United States)

    Polk, J E; Marrese-Reading, C M; Thornber, B; Dang, L; Johnson, L K; Katz, I

    2007-09-01

    Life-limiting processes in hollow cathodes are determined largely by the temperature of the electron emitter. To support cathode life assessment, a noncontact temperature measurement technique which employs a stepper motor-driven fiber optic probe was developed. The probe is driven inside the hollow cathode and collects light radiated by the hot interior surface of the emitter. Ratio pyrometry is used to determine the axial temperature profile. Thermocouples on the orifice plate provide measurements of the external temperature during cathode operation and are used to calibrate the pyrometer system in situ with a small oven enclosing the externally heated cathode. The diagnostic method and initial measurements of the temperature distribution in a hollow cathode are discussed.

  1. Cathodic electrocatalyst layer for electrochemical generation of hydrogen peroxide

    Science.gov (United States)

    Rhodes, Christopher P. (Inventor); Tennakoon, Charles L. K. (Inventor); Singh, Waheguru Pal (Inventor); Anderson, Kelvin C. (Inventor)

    2011-01-01

    A cathodic gas diffusion electrode for the electrochemical production of aqueous hydrogen peroxide solutions. The cathodic gas diffusion electrode comprises an electrically conductive gas diffusion substrate and a cathodic electrocatalyst layer supported on the gas diffusion substrate. A novel cathodic electrocatalyst layer comprises a cathodic electrocatalyst, a substantially water-insoluble quaternary ammonium compound, a fluorocarbon polymer hydrophobic agent and binder, and a perfluoronated sulphonic acid polymer. An electrochemical cell using the novel cathodic electrocatalyst layer has been shown to produce an aqueous solution having between 8 and 14 weight percent hydrogen peroxide. Furthermore, such electrochemical cells have shown stable production of hydrogen peroxide solutions over 1000 hours of operation including numerous system shutdowns.

  2. Rf Gun with High-Current Density Field Emission Cathode

    International Nuclear Information System (INIS)

    Jay L. Hirshfield

    2005-01-01

    High current-density field emission from an array of carbon nanotubes, with field-emission-transistor control, and with secondary electron channel multiplication in a ceramic facing structure, have been combined in a cold cathode for rf guns and diode guns. Electrodynamic and space-charge flow simulations were conducted to specify the cathode configuration and range of emission current density from the field emission cold cathode. Design of this cathode has been made for installation and testing in an existing S-band 2-1/2 cell rf gun. With emission control and modulation, and with current density in the range of 0.1-1 kA/cm2, this cathode could provide performance and long-life not enjoyed by other currently-available cathodes

  3. Structured electron beams from nano-engineered cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Lueangaramwong, A. [NICADD, DeKalb; Mihalcea, D. [NICADD, DeKalb; Andonian, G. [RadiaBeam Tech.; Piot, P. [Fermilab

    2017-03-07

    The ability to engineer cathodes at the nano-scale have open new possibilities such as enhancing quantum eciency via surface-plasmon excitation, forming ultra-low-emittance beams, or producing structured electron beams. In this paper we present numerical investigations of the beam dynamics associated to this class of cathode in the weak- and strong-field regimes.We finally discuss the possible applications of some of the achievable cathode patterns when coupled with other phase space manipulations.

  4. Molten carbonate fuel cell cathode with mixed oxide coating

    Science.gov (United States)

    Hilmi, Abdelkader; Yuh, Chao-Yi

    2013-05-07

    A molten carbonate fuel cell cathode having a cathode body and a coating of a mixed oxygen ion conductor materials. The mixed oxygen ion conductor materials are formed from ceria or doped ceria, such as gadolinium doped ceria or yttrium doped ceria. The coating is deposited on the cathode body using a sol-gel process, which utilizes as precursors organometallic compounds, organic and inorganic salts, hydroxides or alkoxides and which uses as the solvent water, organic solvent or a mixture of same.

  5. Development of spray coated cathodes for RITS-6.

    Energy Technology Data Exchange (ETDEWEB)

    Simpson, Sean; Leckbee, Joshua J.; Miller, Stephen Samuel

    2013-09-01

    This report documents work conducted in FY13 to conduct a feasibility study on thermal spray coated cathodes to be used in the RITS-6 accelerator in an attempt to improve surface uniformity and repeatability. Currently, the cathodes are coated with colloidal silver by means of painting by hand. It is believed that improving the cathode coating process could simplify experimental setup and improve flash x-ray radiographic performance. This report documents the experimental setup and summarizes the results of our feasibility study. Lastly, it describes the path forward and potential challenges that must be overcome in order to improve the process for creating uniform and repeatable silver coatings for cathodes.

  6. Geiger counters of gamma rays with a bismuth cathode

    International Nuclear Information System (INIS)

    Meunier, R.; Legrand, J.P.

    1953-01-01

    Geiger Muller counters present a lake of efficiency of some per cent, for the γ radiations. In the region 0,3 - 1 MeV, a substantial growth of their output can be obtained by a special construction of their cathode. In accordance with previous works, we constructed some counter of formed cathode by a pleated copper wire fencing covered of Bi by electrolysis. The successive modifications brought to a cylindrical conventional cathode in sheet metal of copper, that succeeds to this type of cathode, drive to an improvement of the output. (M.B.) [fr

  7. Measuring current emission and work functions of large thermionic cathodes

    International Nuclear Information System (INIS)

    Fortgang, C.M.

    2001-01-01

    As one component of the nations Stockpile Stewardship program, Los Alamos National Laboratory is constructing a 20 MeV, 2 kA (with a 4 kA upgrade capability), 3ps induction linac for doing x-ray radiography of explosive devices. The linac is one leg of a facility called the Dual-Axis Radiography Hydrodynamic Test Facility (DARHT). The electron gun is designed to operate at 3.2 MV. The gun is a Pierce type design and uses a 6.5' cathode for 2 kA operation and an 8' cathode for 4 kA operation. We have constructed a small facility called the Cathode Test Stand (CTS) to investigate engineering and physics issues regarding large thermionic dispenser-cathodes. In particular, we have looked at the issues of temperature uniformity on the cathode surface and cathode quality as measured by its work function. We have done thermal imaging of both 8' and 6.5' cathodes. Here we report on measurements of the cathode work function, both the average value and how it vanes across the face of the cathode.

  8. Surface Characterization of the LCLS RF Gun Cathode

    International Nuclear Information System (INIS)

    Brachmann, Axel; Decker, Franz-Josef; Ding, Yuantao; Dowell, David; Emma, Paul; Frisch, Josef; Gilevich, Sasha; Hays, Gregory; Hering, Philippe; Huang, Zhirong; Iverson, Richard; Loos, Henrik; Miahnahri, Alan; Nordlund, Dennis; Nuhn, Heinz-Dieter; Pianetta, Piero; Turner, James; Welch, James; White, William; Wu, Juhao; Xiang, Dao

    2012-01-01

    The first copper cathode installed in the LCLS RF gun was used during LCLS commissioning for more than a year. However, after high charge operation (> 500 pC), the cathode showed a decline of quantum efficiency within the area of drive laser illumination. They report results of SEM, XPS and XAS studies that were carried out on this cathode after it was removed from the gun. X-ray absorption and X-ray photoelectron spectroscopy reveal surface contamination by various hydrocarbon compounds. In addition they report on the performance of the second installed cathode with emphasis on the spatial distribution of electron emission.

  9. Large area dispenser cathode applied to high current linac

    International Nuclear Information System (INIS)

    Yang Anmin; China Academy of Engineering Physics, Mianyang; Wu Dengxue; Liu Chenjun; Xia Liansheng; Wang Wendou; Zhang Kaizhi

    2005-01-01

    The paper introduced a dispenser cathode (411 M) which was 55 mm in diameter. A 200 kV long pulsed power generator with 2 μs flattop based on Marx-PEN and system with heat and voltage insulation were built. A 52 A space charge limited current was gained, when the temperature was 1165 degree C and the filament current was 18 A on the cathode and the voltage of the pulse was 75 kV at the cathode test stand. Experimental results show that the current values are consistent with the numerical simulation. The experiment reveals that the deflated gas will influence the cathode emission ability. (authors)

  10. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Wintec

    bone tissue engineering. 45S5-coated implants exhibited greater bone ingrowth compared with HA-coated implants, and they maintained their mechanical integrity over time. (Wheeler et al 2001). And the biological performance of the BG/HA sputter coating is more excellent (Wolke et al. 2005). Zirconia (ZrO2), especially ...

  11. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    In the present work, we report preparation of silicon dioxide, silicon nitride and piezoelec- tric ZnO films by RF sputtering process. The properties of these films relevant for MEMS applications have been evaluated. The application of these films in fabricating basic MEMS structures such as diaphragm, micro-cantilever beams ...

  12. Sputtering of solid deuterium by He-ions

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Pedrys, R.

    2001-01-01

    Sputtering of solid deuterium by bombardment of 3He+ and 4He+ ions was studied. Some features are similar to hydrogen ion bombardment of solid deuterium, but for the He-ions a significant contribution of elastic processes to the total yield can be identified. The thin-film enhancement is more...... pronounced than that for hydrogen projectiles in the same energy range....

  13. Sputtering of solid neon by keV hydrogen ions

    DEFF Research Database (Denmark)

    Ellegaard, Ole; Schou, Jørgen; Sørensen, H.

    1986-01-01

    Sputtering of solid Ne with the hydrogen ions H+1, H+2 and H+3 in the energy range 1–10 keV/atom has been studied by means of a quartz microbalance technique. No enhancement in the yield per atom for molecular ions was found. The results for hydrogen ions are compared with data for keV electrons...

  14. Beam optics optimization of a negative-ion sputter source

    Indian Academy of Sciences (India)

    A negative-ion sputter source has been studied in order to increase the beam intensity delivered by the Vivitron tandem injector. The aim was to characterize the influence on the beam intensity of some factors related to the configuration of the source such as the shape of the target holder, the target surface topography and ...

  15. Physicochemical model for reactive sputtering of hot target

    Energy Technology Data Exchange (ETDEWEB)

    Shapovalov, Viktor I., E-mail: vishapovalov@mail.ru; Karzin, Vitaliy V.; Bondarenko, Anastasia S.

    2017-02-05

    A physicochemical model for reactive magnetron sputtering of a metal target is described in this paper. The target temperature in the model is defined as a function of the ion current density. Synthesis of the coating occurs due to the surface chemical reaction. The law of mass action, the Langmuir isotherm and the Arrhenius equation for non-isothermal conditions were used for mathematical description of the reaction. The model takes into consideration thermal electron emission and evaporation of the target surface. The system of eight algebraic equations, describing the model, was solved for the tantalum target sputtered in the oxygen environment. It was established that the hysteresis effect disappears with the increase of the ion current density. - Highlights: • When model is applied for a cold target, hysteresis width is proportional to the ion current density. • Two types of processes of hot target sputtering are possible, depending on the current density: with and without the hysteresis. • Sputtering process is dominant at current densities less than 50 A/m{sup 2} and evaporation can be neglected. • For current densities over 50 A/m{sup 2} the hysteresis width reaches its maximum and the role of evaporation increases.

  16. Doubly Charged Ion Emission in Sputtering of Monocrystalline Fluorides

    Czech Academy of Sciences Publication Activity Database

    Lörinčík, Jan; Šroubek, Zdeněk

    2002-01-01

    Roč. 187, - (2002), s. 447-450 ISSN 0168-583X R&D Projects: GA ČR GA202/99/0881; GA AV ČR IAA1067801 Institutional research plan: CEZ:AV0Z4040901 Keywords : secondary ion emission * doubly charged * sputtering Subject RIV: CF - Physical ; Theoretical Chemistry Impact factor: 1.158, year: 2002

  17. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 e...

  18. Development of ion beam sputtering techniques for actinide target preparation

    Science.gov (United States)

    Aaron, W. S.; Zevenbergen, L. A.; Adair, H. L.

    1985-06-01

    Ion beam sputtering is a routine method for the preparation of thin films used as targets because it allows the use of a minimum quantity of starting material, and losses are much lower than most other vacuum deposition techniques. Work is underway in the Isotope Research Materials Laboratory (IRML) at ORNL to develop the techniques that will make the preparation of actinide targets up to 100 μg/cm 2 by ion beam sputtering a routinely available service from IRML. The preparation of the actinide material in a form suitable for sputtering is a key to this technique, as is designing a sputtering system that allows the flexibility required for custom-ordered target production. At present, development work is being conducted on low-activity actinides in a bench-top system. The system will then be installed in a hood or glove box approved for radioactive materials handling where processing of radium, actinium, and plutonium isotopes among others will be performed.

  19. On the microstructure and interfacial properties of sputtered nickel ...

    Indian Academy of Sciences (India)

    Administrator

    (Walker et al 1990; Johnson 1991; Fu et al 2004). For a. Ti–Ni thin film to work as micro-device, control over working temperature and compositional tuning during deposition are the prime requisites. Due to inflexibility in composition adjustment, the fabrication of the Ti–Ni thin film by sputter deposition with Ti–Ni alloy target ...

  20. Application of magnetron sputtering for producing bioactive ceramic ...

    Indian Academy of Sciences (India)

    Wintec

    Mechanical Engineering Department, Jinan Vocational College, Shandong Jinan 250103, P.R. China. MS received 9 March 2008; revised 10 September 2008. Abstract. Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings.

  1. Residual stress in magnetron sputtered TiN

    NARCIS (Netherlands)

    Zoestbergen, E; de Hosson, J.T.M.; Brebbia, CA; Kenny, JM

    1999-01-01

    In this study magnetron sputtered TiN layers are investigated with X-ray diffraction. The measurements show that there is a texture present and in these layers a non-linear d-sin(2)psi behavior for the (200) planes was found. The latter cannot be explained by the well-known causes that may generate

  2. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

  3. On the microstructure and interfacial properties of sputtered nickel ...

    Indian Academy of Sciences (India)

    Administrator

    migration of adatoms. When films are sputter deposited on substrate held at higher temperature, surface migration of the adatoms with higher energy takes place. This is due to the fact that the adatoms gain additional energy apart from the kinetic energy while they reach the grow- ing film surface. This would result in the ...

  4. Particle dynamics during electronic sputtering of solid krypton

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    We have modeled electronic sputtering of solid krypton by excimer production with molecular dynamics. Both excimer evolution in the solid and deexcitation processes have been incorporated in the simulation. The excimer dynamics in the lattice has been analyzed: the excimers formed near the surface...

  5. Modular design of AFM probe with sputtered silicon tip

    DEFF Research Database (Denmark)

    Rasmussen, Peter; Thaysen, Jacob; Bouwstra, Siebe

    2001-01-01

    of the thin films constituting the cantilever. The AFM probe has an integrated tip made of a thick sputtered silicon layer, which is deposited after the probe has been defined and just before the cantilevers are released. The tips are so-called rocket tips made by reactive ion etching. We present probes...

  6. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  7. Low-damage high-throughput grazing-angle sputter deposition on graphene

    International Nuclear Information System (INIS)

    Chen, C.-T.; Gajek, M.; Raoux, S.; Casu, E. A.

    2013-01-01

    Despite the prevalence of sputter deposition in the microelectronics industry, it has seen very limited applications for graphene electronics. In this letter, we report systematic investigation of the sputtering induced damages in graphene and identify the energetic sputtering gas neutrals as the primary cause of graphene disorder. We further demonstrate a grazing-incidence sputtering configuration that strongly suppresses fast neutral bombardment and retains graphene structure integrity, creating considerably lower damage than electron-beam evaporation. Such sputtering technique yields fully covered, smooth thin dielectric films, highlighting its potential for contact metals, gate oxides, and tunnel barriers fabrication in graphene device applications

  8. Coated particles for lithium battery cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Mohit; Eitouni, Hany Basam; Pratt, Russell Clayton; Mullin, Scott Allen; Wang, Xiao-Liang

    2017-07-18

    Particles of cathodic materials are coated with polymer to prevent direct contact between the particles and the surrounding electrolyte. The polymers are held in place either by a) growing the polymers from initiators covalently bound to the particle, b) attachment of the already-formed polymers by covalently linking to functional groups attached to the particle, or c) electrostatic interactions resulting from incorporation of cationic or anionic groups in the polymer chain. Carbon or ceramic coatings may first be formed on the surfaces of the particles before the particles are coated with polymer. The polymer coating is both electronically and ionically conductive.

  9. Cathode Readout with Stripped Resistive Drift Tubes

    International Nuclear Information System (INIS)

    Bychkov, V.N.; Kekelidze, G.D.; Novikov, E.A.; Peshekhonov, V.D.; Shafranov, M.D.; Zhil'tsov, V.E.

    1994-01-01

    A straw tube drift chamber prototype has been constructed and tested. The straw tube material is mylar film covered with carbon layer of resistivity 0.5, 30 and 70 k Ohm/sq. The gas mixture used was Ar/CH 4 . Both the anode wire and cathode signals were detected in order to study the behaviour of the chamber in the presence of X-ray ionization. The construction and the results of the study are presented. 7 refs., 11 figs., 1 tab

  10. Low noise PWC cathode readout system

    International Nuclear Information System (INIS)

    Cisneros, E.; Hutchinson, D.; McShurley, D.; Richter, R.; Shapiro, S.

    1980-10-01

    A system has been developed, primarily to detect the induced charge deposited on PWC cathodes, which is versatile, fast and has a good signal to noise ratio for signals of greater than or equal to 10 -14 Coulomb input. The amplifier system, which is completely separated from the detector by 95 Ω coaxial cables, is followed by a new charge integrating, version of the SHAM/BADC system developed at SLAC. This SHAM IV system is CAMAC based, allowing for computer calibration of the entire system from amplifier through ADC

  11. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  12. Evaluation of microbial fuel cell operation using algae as an oxygen supplier: carbon paper cathode vs. carbon brush cathode.

    Science.gov (United States)

    Kakarla, Ramesh; Min, Booki

    2014-12-01

    Microbial fuel cell (MFC) and its cathode performances were compared with use of carbon fiber brush and plain carbon paper cathode electrodes in algae aeration. The MFC having carbon fiber brush cathode exhibited a voltage of 0.21 ± 0.01 V (1,000 Ω) with a cathode potential of around -0.14 ± 0.01 V in algal aeration, whereas MFC with plain carbon paper cathode resulted in a voltage of 0.06 ± 0.005 V with a cathode potential of -0.39 ± 0.01 V. During polarizations, MFC equipped with carbon fiber brush cathode showed a maximum power density of 30 mW/m(2), whereas the MFC equipped with plain carbon paper showed a power density of 4.6 mW/m(2). In algae aeration, the internal resistance with carbon fiber brush cathode was 804 Ω and with plain carbon paper it was 1,210 Ω. The peak currents of MFC operation with carbon fiber brush and plain carbon paper cathodes were -31 mA and -850 µA, respectively.

  13. Solid oxide fuel cells with apatite-type lanthanum silicate-based electrolyte films deposited by radio frequency magnetron sputtering

    Science.gov (United States)

    Liu, Yi-Xin; Wang, Sea-Fue; Hsu, Yung-Fu; Wang, Chi-Hua

    2018-03-01

    In this study, solid oxide fuel cells (SOFCs) containing high-quality apatite-type magnesium doped lanthanum silicate-based electrolyte films (LSMO) deposited by RF magnetron sputtering are successfully fabricated. The LSMO film deposited at an Ar:O2 ratio of 6:4 on an anode supported NiO/Sm0.2Ce0·8O2-δ (SDC) substrate followed by post-annealing at 1000 °C reveals a uniform and dense c-axis oriented polycrystalline structure, which is well adhered to the anode substrate. A composite SDC/La0·6Sr0·4Co0·2Fe0·8O3-δ cathode layer is subsequently screen-printed on the LSMO deposited anode substrate and fired. The SOFC fabricated with the LSMO film exhibits good mechanical integrity. The single cell with the LSMO layer of ≈2.8 μm thickness reports a total cell resistance of 1.156 and 0.163 Ωcm2, open circuit voltage of 1.051 and 0.982 V, and maximum power densities of 0.212 and 1.490 Wcm-2 at measurement temperatures of 700 and 850 °C, respectively, which are comparable or superior to those of previously reported SOFCs with yttria stabilized zirconia electrolyte films. The results of the present study demonstrate the feasibility of deposition of high-quality LSMO films by RF magnetron sputtering on NiO-SDC anode substrates for the fabrication of SOFCs with good cell performance.

  14. Structural and Mechanical Properties of CrNx Coatings Deposited by Medium-Frequency Magnetron Sputtering with and without Ion Source Assistance

    International Nuclear Information System (INIS)

    Tian, C.X.; He, J.; Wang, H.J.; Fu, D.J.; Yang, B.

    2011-01-01

    CrNx coatings were deposited on Si (100) and WC-Co substrates by a home-made medium-frequency magnetron sputtering system with and without thermal filament ion source assistance. The structure and composition of the coatings were characterized by X-ray diffraction, atomic force microscopy, scanning electron microscopy, and transmission electron microscopy. The mechanical and tribological properties were assessed by microhardness and pin-on-disc testing. The ion source-assisted system showed a deposition rate of 3.88 μm/h, much higher than the value 2.2 μm/h without ion source assistance. The CrNx coatings prepared with ion source assistance exhibited an increase in microhardness (up to 16.3 GPa) and a decrease in friction coefficient (down to 0.48) at the optimized cathode source-to-substrate distance.

  15. Tailored Core Shell Cathode Powders for Solid Oxide Fuel Cells

    Energy Technology Data Exchange (ETDEWEB)

    Swartz, Scott [NexTech Materials, Ltd.,Lewis Center, OH (United States)

    2015-03-23

    In this Phase I SBIR project, a “core-shell” composite cathode approach was evaluated for improving SOFC performance and reducing degradation of lanthanum strontium cobalt ferrite (LSCF) cathode materials, following previous successful demonstrations of infiltration approaches for achieving the same goals. The intent was to establish core-shell cathode powders that enabled high performance to be obtained with “drop-in” process capability for SOFC manufacturing (i.e., rather than adding an infiltration step to the SOFC manufacturing process). Milling, precipitation and hetero-coagulation methods were evaluated for making core-shell composite cathode powders comprised of coarse LSCF “core” particles and nanoscale “shell” particles of lanthanum strontium manganite (LSM) or praseodymium strontium manganite (PSM). Precipitation and hetero-coagulation methods were successful for obtaining the targeted core-shell morphology, although perfect coverage of the LSCF core particles by the LSM and PSM particles was not obtained. Electrochemical characterization of core-shell cathode powders and conventional (baseline) cathode powders was performed via electrochemical impedance spectroscopy (EIS) half-cell measurements and single-cell SOFC testing. Reliable EIS testing methods were established, which enabled comparative area-specific resistance measurements to be obtained. A single-cell SOFC testing approach also was established that enabled cathode resistance to be separated from overall cell resistance, and for cathode degradation to be separated from overall cell degradation. The results of these EIS and SOFC tests conclusively determined that the core-shell cathode powders resulted in significant lowering of performance, compared to the baseline cathodes. Based on the results of this project, it was concluded that the core-shell cathode approach did not warrant further investigation.

  16. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

    Science.gov (United States)

    Anders, André

    2017-05-01

    High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines magnetron sputtering with pulsed power concepts. By applying power in pulses of high amplitude and a relatively low duty cycle, large fractions of sputtered atoms and near-target gases are ionized. In contrast to conventional magnetron sputtering, HiPIMS is characterized by self-sputtering or repeated gas recycling for high and low sputter yield materials, respectively, and both for most intermediate materials. The dense plasma in front of the target has the dual function of sustaining the discharge and providing plasma-assistance to film growth, affecting the microstructure of growing films. Many technologically interesting thin films are compound films, which are composed of one or more metals and a reactive gas, most often oxygen or nitrogen. When reactive gas is added, non-trivial consequences arise for the system because the target may become "poisoned," i.e., a compound layer forms on the target surface affecting the sputtering yield and the yield of secondary electron emission and thereby all other parameters. It is emphasized that the target state depends not only on the reactive gas' partial pressure (balanced via gas flow and pumping) but also on the ion flux to the target, which can be controlled by pulse parameters. This is a critical technological opportunity for reactive HiPIMS (R-HiPIMS). The scope of this tutorial is focused on plasma processes and mechanisms of operation and only briefly touches upon film properties. It introduces R-HiPIMS in a systematic, step-by-step approach by covering sputtering, magnetron sputtering, reactive magnetron sputtering, pulsed reactive magnetron sputtering, HiPIMS, and finally R-HiPIMS. The tutorial is concluded by considering variations of R-HiPIMS known as modulated pulsed power magnetron sputtering and deep-oscillation magnetron sputtering and combinations of R-HiPIMS with superimposed dc magnetron sputtering.

  17. Contributions of solar-wind induced potential sputtering to the lunar surface erosion rate and it's exosphere

    Science.gov (United States)

    Alnussirat, S. T.; Barghouty, A. F.; Edmunson, J. E.; Sabra, M. S.; Rickman, D. L.

    2018-04-01

    Sputtering of lunar regolith by solar-wind protons and heavy ions with kinetic energies of about 1 keV/amu is an important erosive process that affects the lunar surface and exosphere. It plays an important role in changing the chemical composition and thickness of the surface layer, and in introducing material into the exosphere. Kinetic sputtering is well modeled and understood, but understanding of mechanisms of potential sputtering has lagged behind. In this study we differentiate the contributions of potential sputtering from the standard (kinetic) sputtering in changing the chemical composition and erosion rate of the lunar surface. Also we study the contribution of potential sputtering in developing the lunar exosphere. Our results show that potential sputtering enhances the total characteristic sputtering erosion rate by about 44%, and reduces sputtering time scales by the same amount. Potential sputtering also introduces more material into the lunar exosphere.

  18. Evaluation of the electrical conductivity and corrosion resistance for layers deposited via sputtering on stainless steel

    Science.gov (United States)

    Blanco, J.; Salas, Y.; Jiménez, C.; Pineda, Y.; Bustamante, A.

    2017-12-01

    In some Engineering fields, we need that conductive materials have a mechanic performance and specific electrical for that they maintain conditions or corrosive attack if they are in the environment or if they are closed structure. The stainless steels have an inert film on their surface and it has the function to act in contrast to external agents who generates the corrosion, especially for stings, spoiling the film until to fail. We found a solution taking into account the electrical performance and the anticorrosive; into the process we put recovering of specific oxides on, stainless steel using the method of sputtering with Unbalanced Magnetron, (UBM) varying the oxygen in the reactive environment. The coating obtained had a thickness one micron approximately and we saw on serious structural uniformity [1]. The corrosion resistance was evaluated through the potentiodynamics polarization and electrochemical spectroscopy impedance in NACL according to the standard. The cathode protection is the most important method employed for the corrosion prevention of metallic structures in the soil or immersed on the water. The electrical resistivity was evaluated with the four points methods and it showed a behaviour of diode type in some substrates with a threshold potential in several volts. We noticed a simple resistance solution when it was analysed in the Nyquist graphics whit the Electrochemical Impedance Spectroscopy technique. With on equivalent circuit, for this reason we determinate a variation in the corrosion speed in almost two orders of magnitude when we analysed the potentiodynamics curve by Tafel approximation. The data obtained and analysed show that this type of surface modification maintains the conductivity condition at the interface, improving the resistance in relation whit the corrosion of these elements where the recovering allowed the ionic flow wished for overcoming threshold voltage, acting as an insulator in different cases.

  19. Computer investigations of the influences of magnets for magnetron-sputtering

    International Nuclear Information System (INIS)

    Knotek, O.; Loeffler, F.; Schnaut, U.; Guan, W.

    1993-01-01

    For a long time PVD (Physical-Vapour-Deposition) technology has been applied in various modern technical fields, owing to the wide range of possible coating materials whose potential is virtually unlimited. Besides electronic, optical and decorative applications for PVD films, hard films, in particular, have been widely applied for tool coatings which play important roles for the resistance against wear and corrosion. The MSIP (Magnetron-Sputter-Ion-Plating) coating process is one of the PVD-processes, providing 1) relatively high deposition rates, 2) large deposition areas, and 3) low substrate heating. The magnetron behind the target influences the distribution of the electrons moving in the plasma and the space between the cathode and anode, thus the distribution of the ions impinging on the surface of the target. Since the electrons are distributed unevenly in front of the target, the working gas atoms are therefore unevenly ionized in the plasma and the ions also unevenly bombard the target surface and the erosion of the target surface is uneven. Therefore the investigations of the magnetic field in the MSIP are very important for the optimization of the deposition process and the usage of the target. Generally, the accurate calculations or measurements of the direction and strength of the magnetic field (magnetic induction or magnetic flux density vector B) is difficult in comparison to measurements of the electrical field, because vector B is a vector with varying direction and magnitude. In this paper, it is shown that a magnetic field of a cylindrical magnetron in MSIP-equipment can be quickly simulated through a simple model and the distribution of the field is discussed. (orig.)

  20. Magneto-optical properties of yttrium iron garnet (YIG) thin films elaborated by radio frequency sputtering

    International Nuclear Information System (INIS)

    Boudiar, T.; Payet-Gervy, B.; Blanc-Mignon, M.-F.; Rousseau, J.-J.; Le Berre, M.; Joisten, H.

    2004-01-01

    Thin films of yttrium iron garnet (YIG) are grown by radio frequency magnetron non reactive sputtering system. Thin films are crystallised by heat-treatment to obtain magneto-optical properties. On quartz substrate, the network of cracks observed on the annealed samples can be explained by the difference between the thermal expansion coefficient of substrate and YIG. Physico-chemical analysis shown that the obtained material has a correct stoichiometry and is crystallised as FCC. The Faraday rotation of thin films is measured with a classical ellipsometric system based on transmission which allows us to obtained an accuracy of 0.01 deg. The variation of Faraday rotation is studied on the one hand versus radio frequency power applied to the cathode during the deposition and on the other hand versus the applied magnetic field. The results are compared with those obtained by vibrating sample magnetometer analysis in perpendicular configuration. A maximum Faraday rotation is observed to be 1900 deg./cm at the wavelength of 594nm for a YIG thin film formed on quartz substrate and annealed at 740 deg. C. The values of the Faraday rotation coefficients obtained in the study versus the wavelength are comparable to those of the literature for the bulk material. In order to eliminate the stress due to the heat-treatment, we made some films on single crystals of gadolinium gallium garnet (111) substrates for which thermal expansion coefficient is near than the YIG one. The material crystallises with no crackles and the Faraday effect is equivalent

  1. Experimental and ab initio investigations on textured Li–Mn–O spinel thin film cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, J., E-mail: Julian.Fischer@kit.edu [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Music, D. [RWTH Aachen University, Materials Chemistry, Kopernikusstrasse 10, 52074 Aachen (Germany); Bergfeldt, T.; Ziebert, C.; Ulrich, S.; Seifert, H.J. [Karlsruhe Institute of Technology (KIT), Institute for Applied Materials (IAM), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2014-12-01

    This paper describes the tailored preparation of nearly identical lithium–manganese–oxide thin film cathodes with different global grain orientations. The thin films were synthesized by rf magnetron sputtering from a LiMn{sub 2}O{sub 4}-target in a pure argon plasma. Under appropriate processing conditions, thin films with a cubic spinel structure and a nearly similar density and surface topography but different grain orientation, i.e. (111)- and (440)-textured films, were achieved. The chemical composition was determined by inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The constitution- and microstructure were evaluated by X-ray diffraction and Raman spectroscopy. The surface morphology and roughness were investigated by scanning electron and atomic force microscopy. The differently textured films represent an ideal model system for studying potential effects of grain orientation on the lithium ion diffusion and electrochemical behavior in LiMn{sub 2}O{sub 4}-based thin films. They are nearly identical in their chemical composition, atomic bonding behavior, surface-roughness, morphology and thickness. Our initial ab initio molecular dynamics data indicate that Li ion transport is faster in (111)-textured structure than in (440)-textured one. - Highlights: • Thin film model system of differently textured cubic Li–Mn–O spinels. • Investigation of the Li–Mn–O thin film mass density by X-ray reflectivity. • Ab initio molecular dynamics simulation on Li ion diffusion in LiMn{sub 2}O{sub 4}.

  2. Surface treatment in a cathodic arc plasma. Key step for interface engineering

    International Nuclear Information System (INIS)

    Schoenjahn, C.

    2001-02-01

    The effect of substrate surface treatment (substrate sputter cleaning) in a cathodic arc plasma prior to unbalanced magnetron deposition of transition metal nitride coatings on the performance of the coated components has been investigated. In particular the influence of parameters such as ion species, ion energy and exposure time on the changes in substrate surface topography, microstructure and microchemistry were studied employing transmission electron microscopy, energy dispersive X-ray analysis, electron energy loss spectroscopy, X-ray diffraction, atomic force microscopy and optical microscopy. The consequences for both the microstructure of subsequently grown transition metal nitride coatings and their adhesion were elucidated. The relevance for practical applications was demonstrated using the example of dry high-speed milling tests, which showed that an appropriate choice of substrate surface pre-treatment parameters can double the life time of the coated tools. This was found to be due to an improved adhesion as a result of a combination of reduced oxygen incorporation at the interface between coating and substrate and local epitaxial growth of the coating. The latter is promoted by certain substrate surface pre-treatment procedures, which provide clean surfaces with preserved crystallographic order. (author)

  3. Experimental and ab initio investigations on textured Li–Mn–O spinel thin film cathodes

    International Nuclear Information System (INIS)

    Fischer, J.; Music, D.; Bergfeldt, T.; Ziebert, C.; Ulrich, S.; Seifert, H.J.

    2014-01-01

    This paper describes the tailored preparation of nearly identical lithium–manganese–oxide thin film cathodes with different global grain orientations. The thin films were synthesized by rf magnetron sputtering from a LiMn 2 O 4 -target in a pure argon plasma. Under appropriate processing conditions, thin films with a cubic spinel structure and a nearly similar density and surface topography but different grain orientation, i.e. (111)- and (440)-textured films, were achieved. The chemical composition was determined by inductively coupled plasma optical emission spectroscopy and carrier gas hot extraction. The constitution- and microstructure were evaluated by X-ray diffraction and Raman spectroscopy. The surface morphology and roughness were investigated by scanning electron and atomic force microscopy. The differently textured films represent an ideal model system for studying potential effects of grain orientation on the lithium ion diffusion and electrochemical behavior in LiMn 2 O 4 -based thin films. They are nearly identical in their chemical composition, atomic bonding behavior, surface-roughness, morphology and thickness. Our initial ab initio molecular dynamics data indicate that Li ion transport is faster in (111)-textured structure than in (440)-textured one. - Highlights: • Thin film model system of differently textured cubic Li–Mn–O spinels. • Investigation of the Li–Mn–O thin film mass density by X-ray reflectivity. • Ab initio molecular dynamics simulation on Li ion diffusion in LiMn 2 O 4

  4. Emission from ferroelectric cathodes. Revision 1

    Energy Technology Data Exchange (ETDEWEB)

    Sampayan, S.E.; Caporaso, G.J.; Holmes, C.L.; Lauer, E.J.; Prosnitz, D.; Trimble, D.O.; Westenskow, G.A.

    1993-05-01

    The authors have recently initiated an investigation of electron emission from ferroelectric cathodes. The experimental apparatus consisted of an electron diode and a 250 kV, 12 ohm, 70 ns pulsed high voltage power source. A planar triode modulator driven by a synthesized waveform generator initiates the polarization inversion and allows inversion pulse tailoring. The pulsed high voltage power source is capable of delivering two high voltage pulses within 50 {mu}s of each other and is capable of operating at a sustained repetition rate of 5 Hz. The initial measurements indicate that emission current densities above the Child-Langmuir Space Charge Limit, J{sub CL}, are possible. They explain this effect to be based on a non-zero initial energy of the emitted electrons. They also determined that this effect is strongly coupled to relative timing between the inversion pulse and application of the main anode-cathode pulse. They also have initiated brightness measurements of the emitted beam and estimate a preliminary lower bound to be on the order of 10{sup 9} A/m{sup 2}-rad{sup 2} for currents close to J{sub CL} and factor of two less at currents over 4J{sub CL}. As in previous measurements at this Laboratory, they performed the measurement using a pepper pot technique. Beamlet profiles are recorded with a fast phosphor and gated cameras. They describe their apparatus and preliminary measurements.

  5. Kinetic and Potential Sputtering of Lunar Regolith: The Contribution of the Heavy Highly Charged (Minority) Solar Wind Ions

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    Solar wind sputtering of the lunar surface helps determine the composition of the lunar exosphere and contributes to surface weathering. To date, only the effects of the two dominant solar wind constituents, H+ and He+, have been considered. The heavier, less abundant solar wind constituents have much larger sputtering yields because they have greater mass (kinetic sputtering) and they are highly charged (potential sputtering) Their contribution to total sputtering can therefore be orders of magnitude larger than their relative abundances would suggest

  6. Development of cathode material for lithium-ion batteries

    Directory of Open Access Journals (Sweden)

    Rustam Mukhtaruly Turganaly

    2014-08-01

    Full Text Available The electrochemical characteristics of the cathode material coated with carbon layer has been developed. Various carbon coating methods. There  has been carried out a comparative electrochemical analysis of the coated and uncoated with carbon cathode material. 

  7. The Effect of Substrate Topography on Coating Cathodic Delamination

    DEFF Research Database (Denmark)

    Erik Weinell, Claus; Sørensen, Per A.; Kiil, Søren

    2011-01-01

    This article describes the effect of steel substrate topography on coating cathodic delamination. The study showed that the surface preparation can be used to control and minimize the rate of cathodic delamination. The coating should have maximum wetting properties so that substrates with high...

  8. Cathodes for Solid Oxide Fuel Cells Operating at Low Temperatures

    DEFF Research Database (Denmark)

    Samson, Alfred Junio

    that these nanoparticulate infiltrates have good oxygen reduction capabilities. The significance of the choice of ionic conducting backbone was also addressed by replacing the CGO with Bi2V0.9Cu0.1O5.35 (BICUVOX). Cathodes with a BICUVOX backbone exhibit performance degradation not observed in LSC infiltrated - CGO cathodes...

  9. Microbial Fuel Cell Performance with a Pressurized Cathode Chamber

    Science.gov (United States)

    Microbial fuel cell (MFC) power densities are often constrained by the oxygen reduction reaction rate on the cathode electrode. One important factor for this is the normally low solubility of oxygen in the aqueous cathode solution creating mass transport limitations, which hinder oxygen reduction a...

  10. Impedance Modeling of Solid Oxide Fuel Cell Cathodes

    DEFF Research Database (Denmark)

    Mortensen, Jakob Egeberg; Søgaard, Martin; Jacobsen, Torben

    2010-01-01

    A 1-dimensional impedance model for a solid oxide fuel cell cathode is formulated and applied to a cathode consisting of 50/50 wt% strontium doped lanthanum cobaltite and gadolinia doped ceria. A total of 42 impedance spectra were recorded in the temperature range: 555-852°C and in the oxygen...

  11. Cathodic protection -- Addition of 6 anodes to existing rectifier 31

    International Nuclear Information System (INIS)

    Lane, W.M.

    1995-01-01

    This Acceptance Test Procedure (ATP) has been prepared to demonstrate that the cathodic protection system additions are installed, connected, and function as required by project criteria. The cathodic protection system is for the tank farms on the Hanford Reservation. The tank farms store radioactive wastes

  12. Plasma-induced field emission study of carbon nanotube cathode

    Directory of Open Access Journals (Sweden)

    Yi Shen

    2011-10-01

    Full Text Available An investigation on the plasma-induced field emission (PFE properties of a large area carbon nanotube (CNT cathode on a 2 MeV linear induction accelerator injector is presented. Experimental results show that the cathode is able to emit intense electron beams. Intense electron beams of 14.9–127.8  A/cm^{2} are obtained from the cathode. The CNT cathode desorbs gases from the CNTs during the PFE process. The fast cathode plasma expansion affects the diode perveance. The amount of outgassing is estimated to be 0.06–0.49  Pa·L, and the ratio of outgassing and electron are roughly calculated to be within the range of 170–350 atoms per electron. The effect of the outgassing is analyzed, and the outgassing mass spectrum of the CNT cathode has been studied during the PFE. There is a significant desorption of CO_{2}, N_{2}(CO, and H_{2} gases, which plays an important role during the PFE process. All the experiments demonstrate that the outgassing plays an important role in the formation of the cathode plasma. Moreover, the characteristic turn-on time of the CNT cathode was measured to be 39 ns.

  13. Cathodic disbonding of organic coatings on submerged steel

    Energy Technology Data Exchange (ETDEWEB)

    Knudsen, Ole oeystein

    1998-12-31

    In offshore oil production, submerged steel structures are commonly protected by an organic coating in combination with cathodic protection. The main advantage is that the coating decreases the current demand for cathodic protection. But the coating degrades with time. This thesis studies one of the most important mechanisms for coating degradation in seawater, cathodic disbonding. Seven commercial coatings and two model coatings with various pigmentations have been studied. Parameter studies, microscopy and studies of free films were used in the mechanism investigations. Exposure to simulated North Sea conditions was used in the performance studies. The effect of aluminium and glass barrier pigments on cathodic disbonding was investigated. The mechanism for the effect of the aluminium pigments on cathodic disbonding was also investigated. The transport of charge and oxygen to the steel/coating interface during cathodic disbonding was studied for two epoxy coatings. Cathodic disbonding, blistering and current demand for cathodic protection was measured for nine commercial coatings for submerged steel structures, using the ASTM-G8 standard test and a long term test under simulated North Sea conditions. The relevance of the ASTM-G8 test as a prequalification test was evaluated. 171 refs., 40 figs., 6 tabs.

  14. Impressed current cathodic protection of deep water structures

    Digital Repository Service at National Institute of Oceanography (India)

    Venkatesan, R.

    Of all the various anti-corrosion systems usEd. by offshore structures and ship-building industry to reduce the ravages of sea-water corrosion, cathodic protection is one of the most important. Impressed current cathodic protection (ICCP...

  15. Dynamic Aspects of Solid Solution Cathodes for Electrochemical Power Sources

    DEFF Research Database (Denmark)

    Atlung, Sven; West, Keld; Jacobsen, Torben

    1979-01-01

    Battery systems based on alkali metal anodes and solid solution cathodes,i.e., cathodes based on the insertion of the alkali cation in a "host lattice,"show considerable promise for high energy density storage batteries. Thispaper discusses the interaction between battery requirements...

  16. New doped tungsten cathodes. Applications to power grid tubes

    International Nuclear Information System (INIS)

    Cachard, J. de; Cadoret, K; Martinez, L.; Veillet, D.; Millot, F.

    2001-01-01

    Thermionic emission behavior of tungsten/tungsten carbide modified with rare earth (La, Ce, Y) oxides is examined on account of suitability to deliver important current densities in a thermo-emissive set up and for long lifetime. Work functions of potential cathodes have been determined from Richardson plots for La 2 O 3 doped tungsten and for tungsten covered with variable compositions rare earth tungstates. The role of platinum layers covering the cathode was also examined. Given all cathodes containing mainly lanthanum oxides were good emitters, emphasis was put on service lifetime. Comparisons of lifetime in tungsten doped with rare earth oxides and with rare earth tungstates show that microstructure of the operating cathodes may play the major role in the research of very long lifetime cathodes. Based on these results, tests still running show lifetime compatible with power grid tubes applications. (author)

  17. High Performance Infiltrated Backbones for Cathode-Supported SOFC's

    DEFF Research Database (Denmark)

    Gil, Vanesa; Kammer Hansen, Kent

    2014-01-01

    The concept of using highly ionic conducting backbones with subsequent infiltration of electronically conducting particles has widely been used to develop alternative anode-supported SOFC's. In this work, the idea was to develop infiltrated backbones as an alternative design based on cathode......-supported SOFC. The cathodes are obtained by infiltrating LSM into a sintered either thick (300 μm) yttria stabilized zirconia (YSZ) backbone or a thin YSZ backbone (10-15 μm) integrated onto a thick (300 μm) porous strontium substituted lanthanum manganite (LSM) and YSZ composite. Fabrication challenges...... printed symmetrical cells. Samples with LSM/YSZ composite and YSZ backbones made with graphite+PMMA as pore formers exhibited comparable Rp values to the screen printed LSM/YSZ cathode. This route was chosen as the best to fabricate the cathode supported cells. SEM micrograph of a cathode supported cell...

  18. Air humidity and water pressure effects on the performance of air-cathode microbial fuel cell cathodes

    KAUST Repository

    Ahn, Yongtae

    2014-02-01

    To better understand how air cathode performance is affected by air humidification, microbial fuel cells were operated under different humidity conditions or water pressure conditions. Maximum power density decreased from 1130 ± 30 mW m-2 with dry air to 980 ± 80 mW m -2 with water-saturated air. When the cathode was exposed to higher water pressures by placing the cathode in a horizontal position, with the cathode oriented so it was on the reactor bottom, power was reduced for both with dry (1030 ± 130 mW m-2) and water-saturated (390 ± 190 mW m-2) air. Decreased performance was partly due to water flooding of the catalyst, which would hinder oxygen diffusion to the catalyst. However, drying used cathodes did not improve performance in electrochemical tests. Soaking the cathode in a weak acid solution, but not deionized water, mostly restored performance (960 ± 60 mW m-2), suggesting that there was salt precipitation in the cathode that was enhanced by higher relative humidity or water pressure. These results showed that cathode performance could be adversely affected by both flooding and the subsequent salt precipitation, and therefore control of air humidity and water pressure may need to be considered for long-term MFC operation. © 2013 Elsevier B.V. All rights reserved.

  19. Resonance ionization of sputtered atoms: Progress toward a quantitative technique

    International Nuclear Information System (INIS)

    Calaway, W.F.; Pellin, M.J.; Young, C.E.; Whitten, J.E.; Gruen, D.M.; Coon, S.R.; Texas Univ., Austin, TX; Wiens, R.C.; Burnett, D.S.; Stingeder, G.; Grasserbauer, M.

    1992-01-01

    The combination of RIMS and ion sputtering has been heralded as the ideal means of quantitatively probing the surface of a solid. While several laboratories have demonstrated the extreme sensitivity of combining RIMS with sputtering, less effort has been devoted to the question of accuracy. Using the SARISA instrument developed at Argonne National Laboratory, a number of well-characterized metallic samples have been analyzed. Results from these determinations have been compared with data obtained by several other analytical methods. One significant finding is that impurity measurements down to ppb levels in metal matrices can be made quantitative by employing polycrystalline metal foils as calibration standards. This discovery substantially reduces the effort required for quantitative analysis since a single standard can be used for determining concentrations spanning nine orders of magnitude

  20. Dependance of sputtering yield on incident angle for ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Tanizaki, Hironori; Ooba, Hikaru; Masuhara, Kenichi

    1987-07-01

    The relationship between sputtering yeild (S/sub theta/) and the incident angle (theta) of an ion beam to some metals such as Fe, Ni, Zn and SUS304, was studied by Ion Micro Analyzer (IMA). It was confirmed that S/sub theta/ varied as a function of (costheta)/sup -f/. The value of f was differed with each sample, and ranged from 1.0 to 1.5 in this study. As theta increased, the surface roughness of the sputtered samples became greater, and the depth resolution of the depth profile became worse. It is necessary to pay attention to depth resolution, when various data concerning different incident angles are compared.

  1. Application of ion beam sputtering for diffusion study in solids

    International Nuclear Information System (INIS)

    Shin-ichiro, Fujisawa.

    1989-01-01

    Two techniques involving ion beam sputtering are discussed in relation to their application to diffusion research in cases where the diffusion coefficient is very low. The first of these combines microsectioning by means of ion beam sputtering with a radioactive tracer. Examples given of research using this technique are: self diffusion in single crystals of α-Zr; self diffusion in amorphous metals; temperature and pressure dependence of the self diffusion coefficient in single crystals of Au at low temperatures and in Ge single crystals. The second technique is secondary ion mass spectroscopy (SIMS) depth direction analysis. Recent research using SIMS has included the diffusion of Co impurities in single crystals of Cu and Ge impurity diffusion in Si single crystals. These researches could not have been carried out effectively, or in some cases at all, by means of more conventional techniques. (UK)

  2. Grafting of Gold Nanoparticles on Glass Using Sputtered Gold Interlayers

    Directory of Open Access Journals (Sweden)

    Ondřej Kvítek

    2014-01-01

    Full Text Available Three-step preparation of nanostructured Au layer on glass substrate is described. The procedure starts with sputtered gold interlayer, followed by grafting with dithiols and final coverage with gold nanoparticles (AuNPs. Successful binding of dithiols on the sputtered Au film was confirmed by X-ray photoelectron spectroscopy measurement. AuNPs bound to the surface were observed using atomic force microscopy. Both single nanoparticles and their aggregates were observed. UV-Vis spectra show broadening of surface plasmon resonance peak after AuNPs binding caused by aggregation of AuNPs on the sample surface. Zeta potential measurements suggest that a large part of the dithiol molecules are preferentially bound to the gold interlayer via both –SH groups.

  3. Characterization of magnetron sputtered surface coatings by AES

    International Nuclear Information System (INIS)

    Kahler, C.; Endstrasser, N.; Jaksch, S.; Scheier, P.

    2008-01-01

    Full text: Surface coatings produced by magnetron sputtering are investigated by STM and AES. Thin films of silicon nanoparticles are deposited on highly oriented pyrolytic graphite (HOPG) surfaces by magnetron sputtering. These silicon nanoparticle films are manipulated by means of a variable temperature UHV-STM, to realize lithography on the nanometer scale. Several factors affect the stability of the films and thereby the lifetime of the produced surface structures. To investigate the influence of these parameters, various methods like AFM, AES and XPS have to be applied. The dependence of the surface stability on the grade of oxidation is determined from the ratio between silicon and oxygen. This can be achieved by Auger electron spectroscopy. Our Auger spectrometer was modified in order to allow measuring the time development of the Auger spectrum during the oxidation process. Chemical images are generated by collecting an Auger spectrum at every spot as the primary electron beam is rastered across the sample surface. (author)

  4. Reflection mode XAFS investigations of reactively sputtered thin films.

    Science.gov (United States)

    Lützenkirchen-Hecht, D; Frahm, R

    2001-03-01

    Amorphous Ta-oxide and Sn-nitride thin films were prepared by reactive sputter deposition on smooth float glass substrates and investigated ex situ using reflection mode XAFS. The absorption coefficient mu and its fine structure were extracted from the measured reflection mode XAFS spectra with a method based on the Kramers-Kronig transform. Bond distances, coordination numbers and Debye-Waller factors were determined by a detailed XAFS data analysis and compared to those of reference compounds. In addition, changes of the atomic short range order of the sputter deposited Ta2O5-films induced by a thermal heat treatment in ambient air were examined as a function of the annealing temperature.

  5. Fabrication and characterization of sputtered-carbon microelectrode arrays.

    Science.gov (United States)

    Sreenivas, G; Ang, S S; Fritsch, I; Brown, W D; Gerhardt, G A; Woodward, D J

    1996-06-01

    This paper describes a robust and reliable process for fabricating a novel sputter-deposited, thin-film carbon microelectrode array using standard integrated circuit technologies and silicon micromachining. Sputter-deposited carbon films were investigated as potential candidates for microelectrode materials. The surface properties and cross section of the microelectrode arrays were studied by atomic force microscopy and scanning electron microscopy, respectively. Electrical site impedance, crosstalk, and lifetime (dielectric integrity) of microelectrodes in the array were characterized. Electrochemical response of the microelectrodes to hexaammineruthenium(III) chloride and dopamine were investigated by fast-scan cyclic voltammetry and high-speed, computer-based chronoamperometry; results show that thin-film carbon microelectrodes are well-behaved electrochemically. The thin carbon films offer extremely good electrical, mechanical, and chemical properties and thus qualify as viable candidates for various electroanalytical applications, particularly acute neurophysiological studies.

  6. Sputtering yield of Pu bombarded by fission Fragments from Cf

    Energy Technology Data Exchange (ETDEWEB)

    Danagoulian, Areg [Los Alamos National Laboratory; Klein, Andreas [Los Alamos National Laboratory; Mcneil, Wendy V [Los Alamos National Laboratory; Yuan, Vincent W [Los Alamos National Laboratory

    2008-01-01

    We present results on the yield of sputtering of Pu atoms from a Pu foil, bombarded by fission fragments from a {sup 252}Cf source in transmission geometry. We have found the number of Pu atoms/incoming fission fragments ejected to be 63 {+-} 1. In addition, we show measurements of the sputtering yield as a function of distance from the central axis, which can be understood as an angular distribution of the yield. The results are quite surprising in light of the fact that the Pu foil is several times the thickness of the range of fission fragment particles in Pu. This indicates that models like the binary collision model are not sufficient to explain this behavior.

  7. Molecular dynamic simulations of the sputtering of multilayer organic systems

    CERN Document Server

    Postawa, Z; Piaskowy, J; Krantzman, K; Winograd, N; Garrison, B J

    2003-01-01

    Sputtering of organic overlayers has been modeled using molecular dynamics computer simulations. The investigated systems are composed of benzene molecules condensed into one, two and three layers on an Ag left brace 1 1 1 right brace surface. The formed organic overlayers were bombarded with 4 keV Ar projectiles at normal incidence. The development of the collision cascade in the organic overlayer was investigated. The sputtering yield, mass, internal and kinetic energy distributions of ejected particles have been analyzed as a function of the thickness of the organic layer. The results show that all emission characteristics are sensitive to the variation of layer thickness. Although most of the ejected intact benzene molecules originate from the topmost layer, the emission of particles located initially in second and third layers is significant. The analysis indicates that the metallic substrate plays a dominant role in the ejection of intact organic molecules.

  8. Cationic fluorinated polymer binders for microbial fuel cell cathodes

    KAUST Repository

    Chen, Guang

    2012-01-01

    Fluorinated quaternary ammonium-containing polymers were used as catalyst binders in microbial fuel cell (MFC) cathodes. The performance of the cathodes was examined and compared to NAFION ® and other sulfonated aromatic cathode catalyst binders using linear sweep voltammetry (LSV), impedance spectroscopy, and performance tests in single chamber air-cathode MFCs. The cathodes with quaternary ammonium functionalized fluorinated poly(arylene ether) (Q-FPAE) binders showed similar current density and charge transfer resistance (R ct) to cathodes with NAFION ® binders. Cathodes containing either of these fluorinated binders exhibited better electrochemical responses than cathodes with sulfonated or quaternary ammonium-functionalized RADEL ® poly(sulfone) (S-Radel or Q-Radel) binders. After 19 cycles (19 d), the power densities of all the MFCs declined compared to the initial cycles due to biofouling at the cathode. MFC cathodes with fluorinated polymer binders (1445 mW m -2, Q-FPAE-1.4-H; 1397 mW m -2, Q-FPAE-1.4-Cl; 1277 mW m -2, NAFION ®; and 1256 mW m -2, Q-FPAE-1.0-Cl) had better performance than those with non-fluorinated polymer binders (880 mW m -2, S-Radel; 670 mW m -2, Q-Radel). There was a 15% increase in the power density using the Q-FPAE binder with a 40% higher ion exchange capacity (Q-FPAE-1.4-H compared to Q-FPAE-1.0-Cl) after 19 cycles of operation, but there was no effect on the power production due to counter ions in the binder (Cl -vs. HCO 3 -). The highest-performance cathodes (NAFION ® and Q-FPAE binders) had the lowest charge transfer resistances (R ct) in fresh and in fouled cathodes despite the presence of thick biofilms on the surface of the electrodes. These results show that fluorinated binders may decrease the penetration of the biofilm and associated biopolymers into the cathode structure, which helps to combat MFC performance loss over time. © 2012 The Royal Society of Chemistry.

  9. Pumping mechanisms in sputter-ion pumps low pressure operation

    International Nuclear Information System (INIS)

    Welch, K.M.

    1991-01-01

    It is shown that significant H 2 pumping occurs in the walls of triode pumps. Also, H 2 is pumped in the anode cells of sputter-ion pumps. This pumping occurs in a manner similar to that by which the inert gases are pumped. That is, H 2 is pumped in the walls of the anode cells by high energy neutral burial. Hydrogen in the pump walls and anodes limits the base pressure of the pump

  10. Pumping mechanisms in sputter-ion pumps low pressure operation

    International Nuclear Information System (INIS)

    Welch, K.M.

    1991-01-01

    It is shown that significant H 2 pumping occurs in the walls of triode pumps. Also, H 2 is pumped in the anode cells of sputter-ion pumps. This pumping occurs in a manner similar to that by which the inert gases are pumped. That is, H 2 pumped in the walls of the anode cells by high energy neutral burial. Hydrogen in the pump walls and anodes limits the base pressure of the pump. 13 refs., 5 figs., 1 tab

  11. Cathodic Cage Plasma Nitriding: An Innovative Technique

    Directory of Open Access Journals (Sweden)

    R. R. M. de Sousa

    2012-01-01

    Full Text Available Cylindrical samples of AISI 1020, AISI 316, and AISI 420 steels, with different heights, were simultaneously treated by a new technique of ionic nitriding, entitled cathodic cage plasma nitriding (CCPN, in order to evaluate the efficiency of this technique to produce nitrided layers with better properties compared with those obtained using conventional ionic nitriding technique. This method is able to eliminate the edge effect in the samples, promoting a better uniformity of temperature, and consequently, a smaller variation of the thickness/height relation can be obtained. The compound layers were characterized by X-ray diffraction, optical microscopy, and microhardness test profile. The results were compared with the properties of samples obtained with the conventional nitriding, for the three steel types. It was verified that samples treated by CCPN process presented, at the same temperature, a better uniformity in the thickness and absence of the edge effect.

  12. Properties of cathode materials in alkaline cells

    International Nuclear Information System (INIS)

    Salkind, A.J.; McBreen, J.; Freeman, R.; Parkhurst, W.A.

    1985-01-01

    Conventional and new cathode materials in primary and secondary alkaline cells were investigated for stability, structure, electrochemical reversibility and efficiency. Included were various forms of AgO for reserve-type silver-zinc batteries, a new material - AgNiO/sub 2/ - and several nickel electrodes for nickel-cadmium and nickel-hydrogen cells for aerospace applications. A comparative study was made of the stability of electroformed and chemically prepared AgO. Stability was correlated with impurities detected by XPS and SAM. After the first discharge AgNiO/sub 2/ can be recharged to the monovalent level. The discharge product is predominantly silver. Plastic-bonded nickel electrodes display a second plateau on discharge. Additions of Co(OH)/sub 2/ largely eliminate this

  13. Laser photo-cathode RF-gun

    International Nuclear Information System (INIS)

    Washio, Masakazu

    2006-01-01

    High quality beam generation project based on High-Tech Research Center Project, which has been approved by Ministry of Education, Culture, Sports, Science and Technology in 1999, has been conducted by advanced research institute for science and engineering, Waseda University. In the project, laser photo-cathode RF-gun has been selected for the high quality electron beam source. RF cavities with low dark current, which were made by diamond turning technique have been successfully manufactured. The low emittance electron beam was realized by choosing the modified laser injection technique. The obtained normalized emittance was about 3 mm mrad at 100 pC of electron charge. The soft X-ray beam generation with the energy of 370 eV, which is in the energy region of so-called 'water window', by inverse Compton scattering has been performed by the collision between IR laser and the low emittance electron beams. (author)

  14. Uranium vapor generator: pulsed hollow cathode lamp

    International Nuclear Information System (INIS)

    Carleer, M.; Gagne, J.; Leblanc, B.; Demers, Y.; Mongeau, B.

    1979-01-01

    The production of uranium vapors has been studied in the 5 L 0 6 ground state using a pulsed hollow cathode lamp. The evolution of the 238 U ( 5 L 0 6 ) concentration with time has been studied with Xe and Ar as buffer gases. A density of 2.7 x 10 13 atoms cm -3 was obtained with Xe as a buffer gas. In addition, those measurements, obtained from the absorption of a laser beam tuned to the 5758.143 A ( 5 L 0 6 -17,361 7 L 6 ) transition, allowed the determination of the transition probability A=2.1 x 10 5 sec -1 and of the branching ratio BR=0.08 for this transition

  15. Ion cumulation by conical cathode electrolysis.

    CERN Document Server

    Grishin, V G

    2002-01-01

    Results of solid-state sodium stearate electrolysis with conical and cylindrical cathodes is presented here. Both electric measurement and conical samples destruction can be explained if a stress developing inside the conical sample is much bigger than in the cylindrical case and there is its unlimited amplification along cone slopes. OTHER KEYWORDS: ion, current, solid, symmetry, cumulation, polarization, depolarization, ionic conductor,superionic conductor, ice, crystal, strain, V-center, V-centre, doped crystal, interstitial impurity, intrinsic color center, high pressure technology, Bridgman, anvil, experiment, crowdion, dielectric, proton, layer, defect, lattice, dynamics, electromigration, mobility, muon catalysis, concentration, doping, dopant, conductivity, pycnonuclear reaction, permittivity, dielectric constant, point defects, interstitials, polarizability, imperfection, defect centers, glass, epitaxy, sodium hydroxide, metallic substrate, crystallization, point, tip, susceptibility, ferroelectric, ...

  16. Olivine-type cathodes. Achievements and problems

    Science.gov (United States)

    Yamada, Atsuo; Hosoya, Mamoru; Chung, Sai-Cheong; Kudo, Yoshihiro; Hinokuma, Koichiro; Liu, Kuang-Yu; Nishi, Yoshio

    The recent progress at Sony in the design of practical olivine-type cathodes is reviewed briefly. First principle calculations revealed LiFePO 4 is a semiconductor with ca. 0.3 eV band gap and LiMnPO 4 is an insulator with ca. 2 eV band gap, which seems the major intrinsic obstacle to a smooth redox reaction at 4 V in the Mn-rich phase. Attention is also focused on the lattice frustration induced by the strong electron (Mn 3+: 3d 4-e gσ ∗)-lattice interaction (Jahn-Teller effect) in the charged state of Li(Mn yFe 1- y)PO 4 (0≤ y≤1). Dense nanocomposite formation with disordered conductive carbon as well as the choice of the appropriate synthetic precursors is highlighted as important engineering aspects, followed by some specific issues concerning tolerance to unusual conditions.

  17. Properties of cathode materials in alkaline cells

    Science.gov (United States)

    Salkind, A. J.; McBreen, J.; Freeman, R.; Parkhurst, W. A.

    1984-04-01

    Conventional and new cathode materials in primary and secondary alkaline cells were investigated for stability, structure, electrochemical reversibility and efficiency. Included were various forms of AgO for reserve type silver zinc batteries, a new material - AgNiO2 and several nickel electrodes for nickel cadmium and nickel hydrogen cells for aerospace applications. A comparative study was made of the stability of electroformed and chemically prepared AgO. Stability was correlated with impurities. After the first discharge AgNiO2 can be recharged to the monovalent level. The discharge product is predominantly silver. Plastic bonded nickel electrodes display a second plateau on discharge. Additions of Co(OH)2 largely eliminate this.

  18. Using cathode spacers to minimize reactor size in air cathode microbial fuel cells

    KAUST Repository

    Yang, Qiao

    2012-04-01

    Scaling up microbial fuel cells (MFCs) will require more compact reactor designs. Spacers can be used to minimize the reactor size without adversely affecting performance. A single 1.5mm expanded plastic spacer (S1.5) produced a maximum power density (973±26mWm -2) that was similar to that of an MFC with the cathode exposed directly to air (no spacer). However, a very thin spacer (1.3mm) reduced power by 33%. Completely covering the air cathode with a solid plate did not eliminate power generation, indicating oxygen leakage into the reactor. The S1.5 spacer slightly increased columbic efficiencies (from 20% to 24%) as a result of reduced oxygen transfer into the system. Based on operating conditions (1000ς, CE=20%), it was estimated that 0.9Lh -1 of air would be needed for 1m 2 of cathode area suggesting active air flow may be needed for larger scale MFCs. © 2012 Elsevier Ltd.

  19. Synchrotron X-Ray Studies of Model SOFC Cathodes, Part I: Thin Film Cathodes.

    Energy Technology Data Exchange (ETDEWEB)

    Chang, Kee-Chul; Ingram, Brian; Ilavsky, Jan; Lee, Shiwoo; Fuoss, Paul; You, Hoydoo

    2017-11-15

    We present synchrotron x-ray investigations of thin film La0.6Sr0.4Co0.2Fe0.8O3-δ (LSCF) model cathodes for solid oxide fuel cells, grown on electrolyte substrates by pulse laser deposition, in situ during half-cell operations. We observed dynamic segregations of cations, such as Sr and Co, on the surfaces of the film cathodes. The effects of temperature, applied potentials, and capping layers on the segregations were investigated using a surfacesensitive technique of total external reflection x-ray fluorescence. We also studied patterned thin film LSCF cathodes using high-resolution micro-beam diffraction measurements. We find chemical expansion decreases for narrow stripes. This suggests the expansion is dominated by the bulk pathway reactions. The chemical expansion vs. the distance from the electrode contact was measured at three temperatures and an oxygen vacancy activation energy was estimated to be ~1.4 eV.

  20. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  1. Arc generation from sputtering plasma-dielectric inclusion interactions

    CERN Document Server

    Wickersham, C E J; Fan, J S

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al sub 2 O sub 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect...

  2. Energy and mass dependence of isotopic enrichment in sputtering

    CERN Document Server

    Shutthanandan, V; Ray, P

    2003-01-01

    Silver, copper, and boron (from a boron nitride target) were sputtered with xenon ions. The isotopic composition of secondary ions of silver was measured at ion energies ranging from 300 eV to 3 keV and, for copper and boron, at 2.0, 2.5, and 3.0 keV. An ion gun was used to generate the ion beam. The secondary ions were detected at a small emission angle by a quadrupole mass spectrometer. The secondary-ion flux of silver was found to be enriched in heavy isotopes at lower incident-ion energies. The heavy-isotope enrichment was observed to decrease with increasing primary-ion energy. Beyond 500 eV, light isotopes of silver were sputtered preferentially with the enrichment increasing to a constant value of 1.018. The sputtered flux of copper and boron also indicated constant enrichments (1.008 and 1.281 for copper and boron respectively) in light isotopes at high ion energies. (orig.)

  3. Assessing Reliability of Cold Spray Sputter Targets in Photovoltaic Manufacturing

    Science.gov (United States)

    Hardikar, Kedar; Vlcek, Johannes; Bheemreddy, Venkata; Juliano, Daniel

    2017-10-01

    Cold spray has been used to manufacture more than 800 Cu-In-Ga (CIG) sputter targets for deposition of high-efficiency photovoltaic thin films. It is a preferred technique since it enables high deposit purity and transfer of non-equilibrium alloy states to the target material. In this work, an integrated approach to reliability assessment of such targets with deposit weight in excess of 50 lb. is undertaken, involving thermal-mechanical characterization of the material in as-deposited condition, characterization of the interface adhesion on cylindrical substrate in as-deposited condition, and developing means to assess target integrity under thermal-mechanical loads during the physical vapor deposition (PVD) sputtering process. Mechanical characterization of cold spray deposited CIG alloy is accomplished through the use of indentation testing and adaptation of Brazilian disk test. A custom lever test was developed to characterize adhesion along the cylindrical interface between the CIG deposit and cylindrical substrate, overcoming limitations of current standards. A cohesive zone model for crack initiation and propagation at the deposit interface is developed and validated using the lever test and later used to simulate the potential catastrophic target failure in the PVD process. It is shown that this approach enables reliability assessment of sputter targets and improves robustness.

  4. Actinide Sputtering Induced by Fission with Ultra-cold Neutrons

    Science.gov (United States)

    Shi, Tan; Venuti, Michael; Fellers, Deion; Martin, Sean; Morris, Chris; Makela, Mark

    2017-09-01

    Understanding the effects of actinide sputtering due to nuclear fission is important for a wide range of applications, including nuclear fuel storage, space science, and national defense. A new program at the Los Alamos Neutron Science Center uses ultracold neutrons (UCN) to induce fission in actinides such as uranium and plutonium. By controlling the UCN energy, it is possible to induce fission at the sample surface within a well-defined depth. It is therefore an ideal tool for studying the effects of fission-induced sputtering as a function of interaction depth. Since the mechanism for fission-induced surface damage is not well understood, this work has the potential to deconvolve the various damage mechanisms. During the irradiation with UCN, NaI detectors are used to monitor the fission events and were calibrated by monitoring fission fragments with an organic scintillator. Alpha spectroscopy of the ejected actinide material is performed in an ion chamber to determine the amount of sputtered material. Actinide samples with various sample properties and surface conditions are irradiated and analyzed. In this talk, I will discuss our experimental setup and present the preliminary results from the testing of multiple samples. This work has been supported by Los Alamos National Laboratory and Seaborg Summer Research Fellowship.

  5. Sequential sputtered Co-HfO{sub 2} granular films

    Energy Technology Data Exchange (ETDEWEB)

    Chadha, M.; Ng, V.

    2017-03-15

    A systematic study of magnetic, magneto-transport and micro-structural properties of Co-HfO{sub 2} granular films fabricated by sequential sputtering is presented. We demonstrate reduction in ferromagnetic-oxide formation by using HfO{sub 2} as the insulting matrix. Microstructure evaluation of the films showed that the film structure consisted of discrete hcp-Co grains embedded in HfO{sub 2} matrix. Films with varying compositions were prepared and their macroscopic properties were studied. We correlate the variation in these properties to the variation in film microstructure. Our study shows that Co-HfO{sub 2} films with reduced cobalt oxide and varying properties can be prepared using sequential sputtering technique. - Highlights: • Co-HfO{sub 2} granular films were prepared using sequential sputtering. • A reduction in ferromagnetic-oxide formation is observed. • Co-HfO{sub 2} films display superparamagnetism and tunnelling magneto-resistance. • Varying macroscopic properties were achieved by changing film composition. • Applications can be found in moderate MR sensors and high –frequency RF devices.

  6. Functional nanostructured titanium nitride films obtained by sputtering magnetron

    International Nuclear Information System (INIS)

    Sanchez, O.; Hernandez-Velez, M.; Navas, D.; Auger, M.A.; Baldonedo, J.L.; Sanz, R.; Pirota, K.R.; Vazquez, M.

    2006-01-01

    Development of new methods in the formation of hollow structures, in particular, nanotubes and nanocages are currently generating a great interest as a consequence of the growing relevance of these nanostructures on many technological fields, ranging from optoelectronics to biotechnology. In this work, we report the formation of titanium nitride (TiN) nanotubes and nanohills via reactive sputtering magnetron processes. Anodic Alumina Membranes (AAM) were used as template substrates to grow the TiN nanostructures. The AAM were obtained through electrochemical anodization processes by using oxalic acid solutions as electrolytes. The nanotubes were produced at temperatures below 100 deg. C, and using a pure titanium (99.995%) sputtering target and nitrogen as reactive gas. The obtained TiN thin films showed surface morphologies adjusted to pore diameter and interpore distance of the substrates, as well as ordered arrays of nanotubes or nanohills depending on the sputtering and template conditions. High Resolution Scanning Electron Microscopy (HRSEM) was used to elucidate both the surface order and morphology of the different grown nanostructures. The crystalline structure of the samples was examined using X-ray Diffraction (XRD) patterns and their qualitative chemical composition by using X-ray Energy Dispersive Spectroscopy (XEDS) in a scanning electron microscopy

  7. Cone formation on copper by ion-beam sputtering

    International Nuclear Information System (INIS)

    Den, A.K.; Ghose, D.

    1991-01-01

    The phenomenon of cone formation on solid surfaces by ion-beam sputtering has been the subject of extensive studies in recent years. The reason for this is that not only do such studies provide a better understanding of the physical processes underlying the cone formation, they also show the importance and relevance of ion-induced textured surfaces in different technologies and experimental techniques. Usually cones are formed by impurity contamination of the target surface during sputtering. In the absence of impurities, a particular target crystallography can result in a high density of cone formation. In the present work the formation and morphologies of cones were studied on a Cu substrate by seeding W-impurities during Kr + -ion sputtering. The results showed that the surface was eroded unevenly and several regions of densely populated cones were formed. The simultaneous appearance of short and tall cones apparently supports both the left-standing and the growth models of cone formation. The cone apex angle was measured and also theoretically predicted. The discrepancy between the two values is possibly due to the neglect of so-called secondary effects. (author)

  8. Electrorefining cell with parallel electrode/concentric cylinder cathode

    Science.gov (United States)

    Gay, Eddie C.; Miller, William E.; Laidler, James J.

    1997-01-01

    A cathode-anode arrangement for use in an electrolytic cell is adapted for electrochemically refining spent nuclear fuel from a nuclear reactor and recovering purified uranium for further treatment and possible recycling as a fresh blanket or core fuel in a nuclear reactor. The arrangement includes a plurality of inner anodic dissolution baskets that are each attached to a respective support rod, are submerged in a molten lithium halide salt, and are rotationally displaced. An inner hollow cylindrical-shaped cathode is concentrically disposed about the inner anodic dissolution baskets. Concentrically disposed about the inner cathode in a spaced manner are a plurality of outer anodic dissolution baskets, while an outer hollow cylindrical-shaped is disposed about the outer anodic dissolution baskets. Uranium is transported from the anode baskets and deposited in a uniform cylindrical shape on the inner and outer cathode cylinders by rotating the anode baskets within the molten lithium halide salt. Scrapers located on each anode basket abrade and remove the spent fuel deposits on the surfaces of the inner and outer cathode cylinders, with the spent fuel falling to the bottom of the cell for removal. Cell resistance is reduced and uranium deposition rate enhanced by increasing the electrode area and reducing the anode-cathode spacing. Collection efficiency is enhanced by trapping and recovery of uranium dendrites scrapped off of the cylindrical cathodes which may be greater in number than two.

  9. Self-organization in cathode boundary layer discharges in xenon

    International Nuclear Information System (INIS)

    Takano, Nobuhiko; Schoenbach, Karl H

    2006-01-01

    Self-organization of direct current xenon microdischarges in cathode boundary layer configuration has been studied for pressures in the range 30-140 Torr and for currents in the range 50 μA-1 mA. Side-on and end-on observations of the discharge have provided information on the structure and spatial arrangement of the plasma filaments. The regularly spaced filaments, which appear in the normal glow mode when the current is lowered, have a length which is determined by the cathode fall. It varies, dependent on pressure and current, between 50 and 70 μm. The minimum diameter is approximately 80 μm, as determined from the radiative emission in the visible. The filaments are sources of extensive excimer emission. Measurements of the cathode fall length have allowed us to determine the secondary emission coefficient for the discharge in the normal glow mode and to estimate the cathode fall voltage at the transition from normal glow mode to filamentary mode. It was found that the cathode fall voltage at this transition decreases, indicating the onset of additional electron gain processes at the cathode. The regular arrangement of the filaments, self-organization, is assumed to be due to Coulomb interactions between the positively charged cathode fall channels and positive space charges on the surface of the surrounding dielectric spacer. Calculations based on these assumptions showed good agreement with experimentally observed filament patterns

  10. High Performance Cathodes for Li-Air Batteries

    Energy Technology Data Exchange (ETDEWEB)

    Xing, Yangchuan

    2013-08-22

    The overall objective of this project was to develop and fabricate a multifunctional cathode with high activities in acidic electrolytes for the oxygen reduction and evolution reactions for Li-air batteries. It should enable the development of Li-air batteries that operate on hybrid electrolytes, with acidic catholytes in particular. The use of hybrid electrolytes eliminates the problems of lithium reaction with water and of lithium oxide deposition in the cathode with sole organic electrolytes. The use of acid electrolytes can eliminate carbonate formation inside the cathode, making air breathing Li-air batteries viable. The tasks of the project were focused on developing hierarchical cathode structures and bifunctional catalysts. Development and testing of a prototype hybrid Li-air battery were also conducted. We succeeded in developing a hierarchical cathode structure and an effective bifunctional catalyst. We accomplished integrating the cathode with existing anode technologies and made a pouch prototype Li-air battery using sulfuric acid as catholyte. The battery cathodes contain a nanoscale multilayer structure made with carbon nanotubes and nanofibers. The structure was demonstrated to improve battery performance substantially. The bifunctional catalyst developed contains a conductive oxide support with ultra-low loading of platinum and iridium oxides. The work performed in this project has been documented in seven peer reviewed journal publications, five conference presentations, and filing of two U.S. patents. Technical details have been documented in the quarterly reports to DOE during the course of the project.

  11. Sputtering of Lunar Regolith Simulant by Protons and Multicharged Heavy Ions at Solar Wind Energies

    Energy Technology Data Exchange (ETDEWEB)

    Meyer, Fred W [ORNL; Harris, Peter R [ORNL; Taylor, C. N. [Purdue University; Meyer III, Harry M [ORNL; Barghouty, N. [NASA Marshall Space Flight Center, Huntsville, AL; Adams Jr., J. [NASA Marshall Space Flight Center, Huntsville, AL

    2011-01-01

    We report preliminary results on sputtering of a lunar regolith simulant at room temperature by singly and multiply charged solar wind ions using quadrupole and time-of-flight (TOF) mass spectrometry approaches. Sputtering of the lunar regolith by solar-wind heavy ions may be an important particle source that contributes to the composition of the lunar exosphere, and is a possible mechanism for lunar surface ageing and compositional modification. The measurements were performed in order to assess the relative sputtering efficiency of protons, which are the dominant constituent of the solar wind, and less abundant heavier multicharged solar wind constituents, which have higher physical sputtering yields than same-velocity protons, and whose sputtering yields may be further enhanced due to potential sputtering. Two different target preparation approaches using JSC-1A AGGL lunar regolith simulant are described and compared using SEM and XPS surface analysis.

  12. Ion sputtering of minerals and glasses: a first step to the simulation of solar wind erosion

    Energy Technology Data Exchange (ETDEWEB)

    Thiel, K.; Sassmannshausen, U.; Kuelzer, H.; Herr, W. (Koeln Univ. (Germany, F.R.). Inst. fuer Kernchemie)

    1982-09-01

    Selected rockforming minerals (plagioclase, augite, olivine, ilmenite, silicate and metal phases of the meteorite 'Brenham') as well as silicate and phosphate glasses were irradiated with heavy ions (/sup 4/He/sup +/, /sup 14/N/sup +/, /sup 20/Ne/sup +/, /sup 40/Ar/sup +/, /sup 56/Fe/sup +/, Xe/sup +/sub(nat)) in the energy range of 50 to 130 keV in order to study ion-induced sputtering. Sputtering yields were measured independently by means of multiple beam interferometry and particle track autoradiography. The theory of sputtering by Sigmund, modified by Smith, was used to convert experimental heavy ion sputtering yields to H/sup +/- and He/sup +/-sputtering yields of the same target. Taking into account solar wind irradiation conditions at the lunar surface, an estimate of lunar erosion rates due to solar wind sputtering is given for the targets studied.

  13. AFM characterization of nonwoven material functionalized by ZnO sputter coating

    International Nuclear Information System (INIS)

    Deng Bingyao; Yan Xiong; Wei Qufu; Gao Weidong

    2007-01-01

    Sputter coatings provide new approaches to the surface functionalization of textile materials. In this study, polyethylene terephthalate (PET) nonwoven material was used as a substrate for creating functional nanostructures on the fiber surfaces. A magnetron sputter coating was used to deposit functional zinc oxide (ZnO) nanostructures onto the nonwoven substrate. The evolution of the surface morphology of the fibers in the nonwoven web was examined using atomic force microscopy (AFM). The AFM observations revealed a significant difference in the morphology of the fibers before and after the sputter coating. The AFM images also indicated the effect of the sputtering conditions on the surface morphology of the fibers. The increase in the sputtering time led to the growth of the ZnO grains on the fiber surfaces. The higher pressure in the sputtering chamber could cause the formation of larger grains on the fiber surfaces. The higher power used also generated larger grains on the fiber surfaces

  14. Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering

    Science.gov (United States)

    Stranak, V.; Hubicka, Z.; Cada, M.; Bogdanowicz, R.; Wulff, H.; Helm, C. A.; Hippler, R.

    2018-03-01

    Iron oxide films were deposited using high power impulse magnetron sputtering (HiPIMS) of an iron cathode in an argon/oxygen gas mixture at different gas pressures (0.5 Pa, 1.5 Pa, and 5.0 Pa). The HiPIMS system was operated at a repetition frequency f  =  100 Hz with a duty cycle of 1%. A main goal is a comparison of film growth during conventional and electron cyclotron wave resonance-assisted HiPIMS. The deposition plasma was investigated by means of optical emission spectroscopy and energy-resolved mass spectrometry. Active oxygen species were detected and their kinetic energy was found to depend on the gas pressure. Deposited films were characterized by means of spectroscopic ellipsometry and grazing incidence x-ray diffraction. Optical properties and crystallinity of as-deposited films were found to depend on the deposition conditions. Deposition of hematite iron oxide films with the HiPIMS–ECWR discharge is attributed to the enhanced production of reactive oxygen species.

  15. Neutral hydrophilic cathode catalyst binders for microbial fuel cells

    KAUST Repository

    Saito, Tomonori

    2011-01-01

    Improving oxygen reduction in microbial fuel cell (MFC) cathodes requires a better understanding of the effects of the catalyst binder chemistry and properties on performance. A series of polystyrene-b-poly(ethylene oxide) (PS-b-PEO) polymers with systematically varying hydrophilicity were designed to determine the effect of the hydrophilic character of the binder on cathode performance. Increasing the hydrophilicity of the PS-b-PEO binders enhanced the electrochemical response of the cathode and MFC power density by ∼15%, compared to the hydrophobic PS-OH binder. Increased cathode performance was likely a result of greater water uptake by the hydrophilic binder, which would increase the accessible surface area for oxygen reduction. Based on these results and due to the high cost of PS-b-PEO, the performance of an inexpensive hydrophilic neutral polymer, poly(bisphenol A-co-epichlorohydrin) (BAEH), was examined in MFCs and compared to a hydrophilic sulfonated binder (Nafion). MFCs with BAEH-based cathodes with two different Pt loadings initially (after 2 cycles) had lower MFC performance (1360 and 630 mW m-2 for 0.5 and 0.05 mg Pt cm-2) than Nafion cathodes (1980 and 1080 mW m -2 for 0.5 and 0.05 mg Pt cm-2). However, after long-term operation (22 cycles, 40 days), power production of each cell was similar (∼1200 and 700-800 mW m-2 for 0.5 and 0.05 mg Pt cm-2) likely due to cathode biofouling that could not be completely reversed through physical cleaning. While binder chemistry could improve initial electrochemical cathode performance, binder materials had less impact on overall long-term MFC performance. This observation suggests that long-term operation of MFCs will require better methods to avoid cathode biofouling. © 2011 The Royal Society of Chemistry.

  16. High Transparent Conductive Aluminum-Doped Zinc Oxide Thin Films by Reactive Co-Sputtering (Postprint)

    Science.gov (United States)

    2016-03-30

    studied such as pulse DC magnetron sputtering with an AZO target [1], RF multi- metallic -target reactive magnetron sputtering [2-3], RF and DC magnetron...Experimental details The AZO films were fabricated using reactive magnetron co-sputtering in an O2 and Ar plasma. The two metallic targets, Zn (50 mm...nm using a Varian Cary 5000 UV-Vis-NIR spectrophotometer . The crystal structure of the films was analyzed by a Distribution A. Approved for public

  17. Functionally Graded Cathodes for Solid Oxide Fuel Cells

    Energy Technology Data Exchange (ETDEWEB)

    YongMan Choi; Meilin Liu

    2006-09-30

    This DOE SECA project focused on both experimental and theoretical understanding of oxygen reduction processes in a porous mixed-conducting cathode in a solid oxide fuel cell (SOFC). Elucidation of the detailed oxygen reduction mechanism, especially the rate-limiting step(s), is critical to the development of low-temperature SOFCs (400 C to 700 C) and to cost reduction since much less expensive materials may be used for cell components. However, cell performance at low temperatures is limited primarily by the interfacial polarization resistances, specifically by those associated with oxygen reduction at the cathode, including transport of oxygen gas through the porous cathode, the adsorption of oxygen onto the cathode surface, the reduction and dissociation of the oxygen molecule (O{sub 2}) into the oxygen ion (O{sup 2-}), and the incorporation of the oxygen ion into the electrolyte. In order to most effectively enhance the performance of the cathode at low temperatures, we must understand the mechanism and kinetics of the elementary processes at the interfaces. Under the support of this DOE SECA project, our accomplishments included: (1) Experimental determination of the rate-limiting step in the oxygen reduction mechanism at the cathode using in situ FTIR and Raman spectroscopy, including surface- and tip-enhanced Raman spectroscopy (SERS and TERS). (2) Fabrication and testing of micro-patterned cathodes to compare the relative activity of the TPB to the rest of the cathode surface. (3) Construction of a mathematical model to predict cathode performance based on different geometries and microstructures and analyze the kinetics of oxygen-reduction reactions occurring at charged mixed ionic-electronic conductors (MIECs) using two-dimensional finite volume models with ab initio calculations. (4) Fabrication of cathodes that are graded in composition and microstructure to generate large amounts of active surface area near the cathode/electrolyte interface using a

  18. Iron phosphate materials as cathodes for lithium batteries

    CERN Document Server

    Prosini, Pier Paolo

    2011-01-01

    ""Iron Phosphate Materials as Cathodes for Lithium Batteries"" describes the synthesis and the chemical-physical characteristics of iron phosphates, and presents methods of making LiFePO4 a suitable cathode material for lithium-ion batteries. The author studies carbon's ability to increase conductivity and to decrease material grain size, as well as investigating the electrochemical behaviour of the materials obtained. ""Iron Phosphate Materials as Cathodes for Lithium Batteries"" also proposes a model to explain lithium insertion/extraction in LiFePO4 and to predict voltage profiles at variou

  19. Preliminary experiments with a carbon fiber tuft cathode

    International Nuclear Information System (INIS)

    Fessenden, T.J.

    1984-01-01

    This work reports initial tests of a carbon brush or tuft cathode intended for use by the Beam Research Program. It was found that electric fields of approximately 100 kV/cm were required to produce current densities above 20 A/sq cm. The beam extracted from the cathode consisted of many beamlets - one for each tuft. The beamlets were found to be quite uniform in peak current density and the cathode operation was microscopically repeatable. The turn-on time was estimated to be 200 ns

  20. Operation and Applications of the Boron Cathodic Arc Ion Source

    International Nuclear Information System (INIS)

    Williams, J. M.; Freeman, J. H.; Klepper, C. C.; Chivers, D. J.; Hazelton, R. C.

    2008-01-01

    The boron cathodic arc ion source has been developed with a view to several applications, particularly the problem of shallow junction doping in semiconductors. Research has included not only development and operation of the boron cathode, but other cathode materials as well. Applications have included a large deposition directed toward development of a neutron detector and another deposition for an orthopedic coating, as well as the shallow ion implantation function. Operational experience is described and information pertinent to commercial operation, extracted from these experiments, is presented.

  1. Effect of sputtering power on structural and optical properties of radio frequency-sputtered In2S3 thin films.

    Science.gov (United States)

    Hwang, Dong Hyun; Cho, Shinho; Hui, Kwun Nam; Son, Young Guk

    2014-12-01

    In this study, we investigated the structural and optical properties of indium sulfide (In2S3) thin films as a substitute for the CdS buffer layer in Cu(In,Ga)Se2 (CIGS) solar cells. The In2S3 films were deposited on glass substrates using radio frequency (RF) magnetron sputtering. The sputtering power was changed from 60 to 120 W in 20 W increments. The effects of sputtering power on the crystallinity, surface morphology, and optical properties of the films were characterized with X-ray diffraction (XRD), atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDS), and UV-visible spectrophotometry. The XRD analyses indicated that the films were polycrystalline β-In2S3 structures with two preferred orientations along the (103) and (206) directions. The AFM images revealed that the films had nanosized grains and that the size increased from 7 nm for the samples prepared at 60 W to 13 nm for those prepared at 120 W. The optical band gap of the samples was found to vary between 2.88 and 2.43 eV.

  2. Vortex trapping in Pb-alloy Josephson junctions induced by strong sputtering of the base electrode

    International Nuclear Information System (INIS)

    Wada, M.; Nakano, J.; Yanagawa, F.

    1985-01-01

    It is observed that strong rf sputtering of the Pb-alloy base electrodes causes the junctions to trap magnetic vortices and thus induces Josephson current (I/sub J/) suppression. Trapping begins to occur when the rf sputtering that removes the native thermal oxide on the base electrode is carried out prior to rf plasma oxidation. Observed large I/sub J/ suppression is presumably induced by the concentration of vortices into the sputtered area upon cooling the sample below the transition temperature. This suggests a new method of the circumvention of the vortex trapping by strongly rf sputtering the areas of the electrode other than the junction areas

  3. Kinetic and Potential Sputtering of Lunar Regolith: Contribution of Solar-Wind Heavy Ions

    Science.gov (United States)

    Meyer, F. W.; Harris, P. R.; Meyer, H. M., III; Hijiazi, H.; Barghouty, A. F.

    2013-01-01

    Sputtering of lunar regolith by protons as well as solar-wind heavy ions is considered. From preliminary measurements of H+, Ar+1, Ar+6 and Ar+9 ion sputtering of JSC-1A AGGL lunar regolith simulant at solar wind velocities, and TRIM simulations of kinetic sputtering yields, the relative contributions of kinetic and potential sputtering contributions are estimated. An 80-fold enhancement of oxygen sputtering by Ar+ over same-velocity H+, and an additional x2 increase for Ar+9 over same-velocity Ar+ was measured. This enhancement persisted to the maximum fluences investigated is approximately 1016/cm (exp2). Modeling studies including the enhanced oxygen ejection by potential sputtering due to the minority heavy ion multicharged ion solar wind component, and the kinetic sputtering contribution of all solar wind constituents, as determined from TRIM sputtering simulations, indicate an overall 35% reduction of near-surface oxygen abundance. XPS analyses of simulant samples exposed to singly and multicharged Ar ions show the characteristic signature of reduced (metallic) Fe, consistent with the preferential ejection of oxygen atoms that can occur in potential sputtering of some metal oxides.

  4. Angular distributions of particles sputtered from multicomponent targets with gas cluster ions

    Energy Technology Data Exchange (ETDEWEB)

    Ieshkin, A.E. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Ermakov, Yu.A., E-mail: yuriermak@yandex.ru [Skobeltsyn Nuclear Physics Research Institute, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation); Chernysh, V.S. [Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory, Moscow 119991 (Russian Federation)

    2015-07-01

    The experimental angular distributions of atoms sputtered from polycrystalline W, Cd and Ni based alloys with 10 keV Ar cluster ions are presented. RBS was used to analyze a material deposited on a collector. It has been found that the mechanism of sputtering, connected with elastic properties of materials, has a significant influence on the angular distributions of sputtered components. The effect of non-stoichiometric sputtering at different emission angles has been found for the alloys under cluster ion bombardment. Substantial smoothing of the surface relief was observed for all targets irradiated with cluster ions.

  5. Spatial structure of radio frequency ring-shaped magnetized discharge sputtering plasma using two facing ZnO/Al2O3 cylindrical targets for Al-doped ZnO thin film preparation

    Directory of Open Access Journals (Sweden)

    Takashi Sumiyama

    2017-05-01

    Full Text Available Spatial structure of high-density radio frequency ring-shaped magnetized discharge plasma sputtering with two facing ZnO/Al2O3 cylindrical targets mounted in ring-shaped hollow cathode has been measured and Al-doped ZnO (AZO thin film is deposited without substrate heating. The plasma density has a peak at ring-shaped hollow trench near the cathode. The radial profile becomes uniform with increasing the distance from the target cathode. A low ion current flowing to the substrate of 0.19 mA/cm2 is attained. Large area AZO films with a resistivity of 4.1 – 6.7×10-4 Ω cm can be prepared at a substrate room temperature. The transmittance is 84.5 % in a visible region. The surface roughnesses of AZO films are 0.86, 0.68, 0.64, 1.7 nm at radial positions of r = 0, 15, 30, 40 mm, respectively, while diffraction peak of AZO films is 34.26°. The grains exhibit a preferential orientation along (002 axis.

  6. Characterization of SiC in DLC/a-Si films prepared by pulsed filtered cathodic arc using Raman spectroscopy and XPS

    International Nuclear Information System (INIS)

    Srisang, C.; Asanithi, P.; Siangchaew, K.; Pokaipisit, A.; Limsuwan, P.

    2012-01-01

    DLC/a-Si films were deposited on germanium substrates. a-Si film was initially deposited as a seed layer on the substrate using DC magnetron sputtering. DLC film was then deposited on the a-Si layer via a pulsed filtered cathodic arc (PFCA) system. In situ ellipsometry was used to monitor the thicknesses of the growth films, allowing a precise control over the a-Si and DLC thicknesses of 6 and 9 nm, respectively. It was found that carbon atoms implanting on a-Si layer act not only as a carbon source for DLC formation, but also as a source for SiC formation. The Raman peak positions at 796 cm -1 and 972 cm -1 corresponded to the LO and TO phonon modes of SiC, respectively, were observed. The results were also confirmed using TEM, XPS binding energy and XPS depth profile analysis.

  7. Micro-cathode Arc Thruster PhoneSat Experiment

    Data.gov (United States)

    National Aeronautics and Space Administration — The Micro-cathode Arc Thruster Phonesat Experiment  was a joint project between George Washington University and NASA Ames Research Center that successfully...

  8. Development of Hollow Cathode of High Power Middle Pressure Arcjet

    National Research Council Canada - National Science Library

    Vaulin, Eujeni

    1995-01-01

    ...: Determine integral performances of arcjet devices in nitrogen, ammonia, and their mixtures using hollow cathode devices at low and high current levels, perform short term tests (up to 50 hours...

  9. TPC cathode read-out with C-pads

    International Nuclear Information System (INIS)

    Janik, R.; Pikna, M.; Sitar, B.; Strmen, P.; Szarka, I.

    2009-01-01

    A Time Projection Chamber with 'C' like shaped cathode pads was built and tested. It offers a low gas gain operation, a good pulse shape and a lightweight construction. The Pad Response Function (PRF), the cathode to anode pulse height ratios and the pad pulse shapes of the C-pad structure were measured and compared with planar cathode structures in two different wire geometries. The cathode to anode signal ratio was improved from between 0.2 and 0.4 up to 0.7. The PRF was considerably improved, it has a Gaussian shape and is narrower than in the case of the planar pads. The pulse shape from the C-pad read-out is similar to the pulse shape from a detector with a cylindrical shape of electrodes. A method for aluminum pad mass production based on a precise cold forging was developed and tested.

  10. Lithium sulfur batteries and electrolytes and sulfur cathodes thereof

    Science.gov (United States)

    Visco, Steven J.; Goncharenko, Nikolay; Nimon, Vitaliy; Petrov, Alexei; Nimon, Yevgeniy S.; De Jonghe, Lutgard C.; Katz, Bruce D.; Loginova, Valentina

    2017-05-23

    Lithium sulfur battery cells that use water as an electrolyte solvent provide significant cost reductions. Electrolytes for the battery cells may include water solvent for maintaining electroactive sulfur species in solution during cell discharge and a sufficient amount of a cycle life-enhancing compound that facilitates charging at the cathode. The combination of these two components enhances one or more of the following cell attributes: energy density, power density and cycle life. For instance, in applications where cost per Watt-Hour (Wh) is paramount, such as grid storage and traction applications, the use of an aqueous electrolyte in combination with inexpensive sulfur as the cathode active material can be a key enabler for the utility and automotive industries, for example, providing a cost effective and compact solution for load leveling, electric vehicles and renewable energy storage. Sulfur cathodes, and methods of fabricating lithium sulfur cells, in particular for loading lithium sulfide into the cathode structures, provide further advantages.

  11. A High Performance Cathode Heater for Hall Thrusters, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — High current hollow cathodes are the baseline electron source for next generation high power Hall thrusters. Currently for electron sources providing current levels...

  12. Reservoir Scandate Cathode for Electric Propulsion, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to combine two revolutionary cathode technologies into a single device for use in electric space propulsion. This will overcome problems that both...

  13. Lipon coatings for high voltage and high temperature Li-ion battery cathodes

    Energy Technology Data Exchange (ETDEWEB)

    Dudney, Nancy J.; Liang, Chengdu; Nanda, Jagjit; Veith, Gabriel M.; Kim, Yoongu; Martha, Surendra Kumar

    2017-12-05

    A lithium ion battery includes an anode and a cathode. The cathode includes a lithium, manganese, nickel, and oxygen containing compound. An electrolyte is disposed between the anode and the cathode. A protective layer is deposited between the cathode and the electrolyte. The protective layer includes pure lithium phosphorus oxynitride and variations that include metal dopants such as Fe, Ti, Ni, V, Cr, Cu, and Co. A method for making a cathode and a method for operating a battery are also disclosed.

  14. Lipon coatings for high voltage and high temperature Li-ion battery cathodes

    Science.gov (United States)

    Dudney, Nancy J.; Liang, Chengdu; Nanda, Jagjit; Veith, Gabriel M.; Kim, Yoongu; Martha, Surendra Kumar

    2017-02-14

    A lithium ion battery includes an anode and a cathode. The cathode includes a lithium, manganese, nickel, and oxygen containing compound. An electrolyte is disposed between the anode and the cathode. A protective layer is deposited between the cathode and the electrolyte. The protective layer includes pure lithium phosphorus oxynitride and variations that include metal dopants such as Fe, Ti, Ni, V, Cr, Cu, and Co. A method for making a cathode and a method for operating a battery are also disclosed.

  15. Fabrication and description of a cold cathode electron gun

    International Nuclear Information System (INIS)

    Sari, A.H.; Ghorannevis, M.; Hantehzadeh, M.R.; Yousefi, M.R.

    2003-01-01

    In this study the structure and schematic configuration of a cold cathode electron gun has been shown, which use obstructed discharge for electron producing. This type of discharge and mechanism of secondary electron emission by ions and fast neutral interaction have been described. The experiment starts in pressure of 1*10 -3 torr, in existence of helium gas. A negative DC voltage apply to a concave cathode up to -20 k V which determine electron energy

  16. High-Current Cold Cathode Employing Diamond and Related Materials

    Energy Technology Data Exchange (ETDEWEB)

    Hirshfield, Jay L. [Omega-P, Inc., New Haven, CT (United States)

    2014-10-22

    The essence of this project was for diamond films to be deposited on cold cathodes to improve their emission properties. Films with varying morphology, composition, and size of the crystals were deposited and the emission properties of the cathodes that utilize such films were studied. The prototype cathodes fabricated by the methods developed during Phase I were tested and evaluated in an actual high-power RF device during Phase II. These high-power tests used the novel active RF pulse compression system and the X-band magnicon test facility at US Naval Research Laboratory. In earlier tests, plasma switches were employed, while tests under this project utilized electron-beam switching. The intense electron beams required in the switches were supplied from cold cathodes embodying diamond films with varying morphology, including uncoated molybdenum cathodes in the preliminary tests. Tests with uncoated molybdenum cathodes produced compressed X-band RF pulses with a peak power of 91 MW, and a maximum power gain of 16.5:1. Tests were also carried out with switches employing diamond coated cathodes. The pulse compressor was based on use of switches employing electron beam triggering to effect mode conversion. In experimental tests, the compressor produced 165 MW in a ~ 20 ns pulse at ~18× power gain and ~ 140 MW at ~ 16× power gain in a 16 ns pulse with a ~ 7 ns flat-top. In these tests, molybdenum blade cathodes with thin diamond coatings demonstrated good reproducible emission uniformity with a 100 kV, 100 ns high voltage pulse. The new compressor does not have the limitations of earlier types of active pulse compressors and can operate at significantly higher electric fields without breakdown.

  17. Chromium (V) compounds as cathode material in electrochemical power sources

    Science.gov (United States)

    Delnick, F.M.; Guidotti, R.A.; McCarthy, D.K.

    A cathode for use in a thermal battery, comprising a chromium (V) compound. The preferred materials for this use are Ca/sub 5/(CrO/sub 4/)/sub 3/Cl, Ca/sub 5/(CrO/sub 4/)OH, and Cr/sub 2/O/sub 5/. The chromium (V) compound can be employed as a cathode material in ambient temperature batteries when blended with a suitably conductive filler, preferably carbon black.

  18. Testing Metal Chlorides For Use In Sodium-Cell Cathodes

    Science.gov (United States)

    Bugga, Ratnakumar V.; Attia, Alan I.; Halpert, Gerald

    1992-01-01

    Cyclic voltammetric curves of transition-metal wires in molten NaAlCl4 electrolyte used to eliminate suitability of transition metals as cathodes in sodium cells. Cyclic voltammetry used in conjunction with measurement of galvanostatic polarization curves determines whether given metal chloride suitable as cathode material in such cell. Cells useful in such high-energy-density and high-power-density applications as leveling loads on electric-power plants, supplying power to electric ground vehicles, and aerospace applications.

  19. Preparation of redox polymer cathodes for thin film rechargeable batteries

    Science.gov (United States)

    Skotheim, Terje A.; Lee, Hung S.; Okamoto, Yoshiyuki

    1994-11-08

    The present invention relates to the manufacture of thin film solid state electrochemical devices using composite cathodes comprising a redox polymer capable of undergoing oxidation and reduction, a polymer solid electrolyte and conducting carbon. The polymeric cathode material is formed as a composite of radiation crosslinked polymer electrolytes and radiation crosslinked redox polymers based on polysiloxane backbones with attached organosulfur side groups capable of forming sulfur-sulfur bonds during electrochemical oxidation.

  20. Cathode erosion in high-current high-pressure arc

    CERN Document Server

    Nemchinsky, V A

    2003-01-01

    Cathode erosion rate was experimentally investigated for two types of arcs: one with tungsten cathode in nitrogen atmosphere and one with hafnium cathode in oxygen atmosphere. Conditions were typical for plasma arc cutting systems: gas pressure from 2 to 5 atm, arc current from 200 to 400 A, gas flow rate from 50 to 130 litre min sup - sup 1. It was found that the actual cathode evaporation rate G is much lower than G sub 0 , the evaporation rate that follows from the Hertz-Knudsen formula: G = nu G sub 0. The difference is because some of the evaporated particles return back to the cathode. For conditions of our experiments, the factor nu could be as low as 0.01. It was shown experimentally that nu depends strongly on the gas flow pattern close to the cathode. In particular, swirling the gas increases nu many times. To explain the influence of gas swirling, model calculations of gas flows were performed. These calculations revealed difference between swirling and non-swirling flows: swirling the gas enhances...

  1. An adjustable electron achromat for cathode lens microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Tromp, R.M., E-mail: rtromp@us.ibm.com [IBM T.J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, NY 10598 (United States); Leiden Institute of Physics, Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA Leiden (Netherlands)

    2015-12-15

    Chromatic aberration correction in light optics began with the invention of a two-color-corrected achromatic crown/flint lens doublet by Chester Moore Hall in 1730. Such color correction is necessary because any single glass shows dispersion (i.e. its index of refraction changes with wavelength), which can be counteracted by combining different glasses with different dispersions. In cathode lens microscopes (such as Photo Electron Emission Microscopy – PEEM) we encounter a similar situation, where the chromatic aberration coefficient of the cathode lens shows strong dispersion, i.e. depends (non-linearly) on the energy with which the electrons leave the sample. Here I show how a cathode lens in combination with an electron mirror can be configured as an adjustable electron achromat. The lens/mirror combination can be corrected at two electron energies by balancing the settings of the electron mirror against the settings of the cathode lens. The achromat can be adjusted to deliver optimum performance, depending on the requirements of a specific experiment. Going beyond the achromat, an apochromat would improve resolution and transmission by a very significant margin. I discuss the requirements and outlook for such a system, which for now remains a wish waiting for fulfilment. - Highlights: • The properties of cathode objective lens plus electron mirror are discussed. • In analogy with light-optical achromats, cathode lens plus mirror can be configured as an electron achromat. • Unlike light optics, the electron achromat can be adjusted to best fulfill experimental requirements.

  2. Cathode degradation and erosion in high pressure arc discharges

    Science.gov (United States)

    Hardy, T. L.; Nakanishi, S.

    1984-01-01

    The various processes which control cathode erosion and degradation were identified and evaluated. A direct current arc discharge was established between electrodes in a pressure-controlled gas flow environment. The cathode holder was designed for easy testing of various cathode materials. The anode was a water cooled copper collector electrode. The arc was powered by a dc power supply with current and voltage regulated cross-over control. Nitrogen and argon were used as propellants and the materials used were two percent thoriated tungsten, barium oxide impregnated porous tungsten, pure tungsten and lanthanum hexaboride. The configurations used were cylindrical solid rods, wire bundles supported by hollow molybdenum tubes, cylindrical hollow tubes, and hollow cathodes of the type used in ion thrusters. The results of the mass loss tests in nitrogen indicated that pure tungsten eroded at a rate more than 10 times faster than the rates of the impregnated tungsten materials. It was found that oxygen impurities of less than 0.5 percent in the nitrogen increased the mass loss rate by a factor of 4 over high purity nitrogen. At power levels less than 1 kW, cathode size and current level did not significantly affect the mass loss rate. The hollow cathode was found to be operable in argon and in nitrogen only at pressures below 400 and 200 torr, respectively.

  3. Lithium Iron Orthosilicate Cathode: Progress and Perspectives

    Energy Technology Data Exchange (ETDEWEB)

    Ni, Jiangfeng [College; amp, Physics (CECMP), Soochow University, Suzhou 215006, PR China; Jiang, Yu [College; amp, Physics (CECMP), Soochow University, Suzhou 215006, PR China; Bi, Xuanxuan [Chemical; Li, Liang [College; amp, Physics (CECMP), Soochow University, Suzhou 215006, PR China; Lu, Jun [Chemical

    2017-07-18

    The pursuit of cathodes with a high capacity is remarkably driven by the ever increasing demand of high-energy lithium ion batteries in electronics and transportation. In this regard, polyanionic lithium iron orthosilicate (Li2FeSiO4) offers a promising opportunity because it affords a high theoretical capacity of 331 mAh g–1. However, such a high theoretical capacity of Li2FeSiO4 has frequently been compromised in practice because of the extremely low electronic and ionic conductivity. To address this issue, material engineering strategies to boost the Li storage kinetics in Li2FeSiO4 have proven indispensable. In this Perspective, we will briefly present the structural characteristics, intrinsic physicochemical properties, and electrochemical behavior of Li2FeSiO4. We particularly focus on recent materials engineering of silicates, which is implemented mainly through advanced synthetic techniques and elaborate controls. This Perspective highlights the importance of integrating theoretical analysis into experimental implementation to further advance the Li2FeSiO4 materials.

  4. Pulsed photoelectric field emission from needle cathodes

    CERN Document Server

    Hernandez-Garcia, C

    2002-01-01

    Experiments have been carried out to measure the current emitted by tungsten needles with 1-mu m tip radius operated up to 50 kV. This corresponds to electric fields in the order of 10 sup 9 to 10 sup 1 sup 0 V/m. The needles were illuminated with 10-ns laser pulses at 532, 355 and 266 nm. The laser intensity was varied from 10 sup 1 sup 0 to 10 sup 1 sup 2 W/m sup 2 , limited by damage to the needle tip. The observed quantum efficiency depends on the wavelength and the electric field, approaching unity at the highest electric fields when illuminated at 266 nm. Peak currents up to 100 mA were observed in nanosecond pulses, corresponding to an estimated brightness of 10 sup 1 sup 6 A/m sup 2 sr. Since the current is controlled by the laser intensity, with only a weak voltage dependence, these cathodes can be used for infrared and ultraviolet tabletop free-electron lasers and other applications that demand short electron-beam pulses with high brightness.

  5. Pd-catalysts for DFAFC prepared by magnetron sputtering

    Czech Academy of Sciences Publication Activity Database

    Bieloshapka, Igor; Jiříček, Petr; Vorokhta, M.; Tomšík, Elena; Rednyk, A.; Perekrestov, R.; Jurek, Karel; Ukraintsev, Egor; Hruška, Karel; Romanyuk, Olexandr; Lesiak, B.

    2017-01-01

    Roč. 419, Oct (2017), s. 838-846 ISSN 0169-4332 R&D Projects: GA ČR(CZ) GBP108/12/G108; GA MŠk LM2015088 Institutional support: RVO:68378271 ; RVO:61389013 Keywords : Pd catalyst * formic acid fuel cell * magnetron sputtering * DFAFC * surface morphology Subject RIV: BM - Solid Matter Physics ; Magnetism; BM - Solid Matter Physics ; Magnetism (UMCH-V) OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.); Condensed matter physics (including formerly solid state physics, supercond.) (UMCH-V) Impact factor: 3.387, year: 2016

  6. Processing-Structure Correlation in DC Sputtered Molybdenum Thin Films

    Science.gov (United States)

    Khan, Majid; Islam, Mohammad; Akram, Aftab; Manzoor, Umair

    2013-12-01

    Molybdenum thin films were sputter deposited under different conditions of DC power and chamber pressure. The structure and topography of the films were investigated using AFM, SEM and XRD techniques. Van der Pauw method and tape test were employed to determine electrical resistivity and interfacial strength to the substrate, respectively. All the films are of sub-micron thickness with maximum growth rate of 78 nm/min and crystallite size in the range of 4 to 21 nm. The films produced at high power and low pressure exhibit compressive residual strains, low electrical resistivity and poor adhesion to the glass substrate, whereas the converse is true for films produced at high pressure.

  7. Particle-balance models for pulsed sputtering magnetrons

    Science.gov (United States)

    Huo, Chunqing; Lundin, D.; Gudmundsson, J. T.; Raadu, M. A.; Bradley, J. W.; Brenning, N.

    2017-09-01

    The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past decade and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 μs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 μs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explores the effects of varying the magnetic field strength. The model results show that Al2+ -ions contribute negligibly to the production of secondary electrons, while Ti2+ -ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al+-ions to the discharge current at the target surface is over 90% at 800 V. However, at 400 V the Al+-ions and Ar+-ions contribute roughly equally to the discharge current in the initial peak, while in the plateau region Ar+-ions contribute to roughly \\frac{2}{3} of the current. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. For the discharge with Ti target, a decrease in the B-field strength, resulted in a corresponding stepwise increase in the discharge resistivity.

  8. Optical Characterization of Porous Sputtered Silver Thin Films

    Directory of Open Access Journals (Sweden)

    Olivier Carton

    2013-01-01

    Full Text Available The optical properties of various porous silver films, grown with a commercial DC sputter coater, were investigated and compared for different plasma parameters. Effective Drude models were successfully used for those films whose spectra did not show particular resonance peaks. For the other films, neither an effective Drude model nor effective medium models (Maxwell Garnett, Bruggeman, and Looyenga can describe the optical properties. It turns out that a more general approach like the Bergman representation describes the optical data of these films accurately adopting porosity values consistent with physical measurements.

  9. SPUTTERED NdFe FILMS WITH PERPENDICULAR ANISOTROPY

    OpenAIRE

    Carey, R.; Crapper, P.; Thomas, B.

    1985-01-01

    Thin films of NdFe with composition in the region of 60 at.% Nd have been prepared by r.f.sputtering on to glass substrates at room temperature and investigated using the polar Kerr effect . All films exhibit relatively square hysteresis loops when the field is reversed along the film normal, many with squareness ratios close to 1.0, and saturation polar Kerr rotations about 0.4°. Some films prepared at very high deposition rates exhibit unusually large coercivities, 1-4kOe, and show a marked...

  10. Low friction coefficient coatings Ni-Cr by magnetron sputtering, DC

    Directory of Open Access Journals (Sweden)

    Morales-Hernández, Jorge

    2015-09-01

    Full Text Available Magnetron Sputter Deposition technique with DC was used for the deposition of Ni-Cr coatings on AISI 316 SS like substrate. The cathode with a nominal composition Ni-22 at% Cr was prepared by Mechanical Alloying (MA technique, with a maximum milling time of 16 hours and, with a high energy SPEX 8000 mill. The coatings were made under Argon atmosphere at room temperature with a power of 100 W at different times of growth. Chemical composition, microstructure, topography, nanohardness and wear of the coatings were evaluated using the techniques of microanalysis by energy dispersive X-ray analyzer (EDAX, X-Ray Diffraction (XRD, Atomic Force Microscopy (AFM, Nano-indentation and pin-on-Disk, respectively. After milling, was not detected contamination in the mixtures. XRD analysis revealed that the microstructure of the Ni-Cr alloy was maintained in the coatings with respect to MA powders, with some degree of recrystallization. Nanohardness values were in the order of 8.8 GPa with a Young’s modulus of 195 GPa. The adhesion of the films was evaluated according to their resistance to fracture when these were indented at different loads using Vickers microhardness. The wear test results showed a decrease in the friction coefficient with respect to the increase of thickness’ films, getting a minimum value of 0.08 with a thickness of 1 μm and which correspond with the maximum growing time.La técnica de Deposición por Chisporroteo Magnético (Magnetron Sputtering con el proceso DC, fue usado para la deposición de los recubrimientos de Ni-Cr sobre acero inoxidable AISI 316 como sustrato. El cátodo con una composición nominal Ni-22 at% Cr fue preparado por la técnica de Aleado Mecánico (AM, con un tiempo máximo de molienda de 16 horas y con un molino de alta energía tipo SPEX 8000. Las películas se realizaron bajo una atmósfera de argón a temperatura ambiente con una potencia de 100 W a diferentes tiempos de crecimiento. La composición qu

  11. Generation of high-density O2 supermagnetron plasma over lower cathode by radio frequency power supply to upper cathode

    Science.gov (United States)

    Kinoshita, Haruhisa

    1994-02-01

    The density of supermagnetron plasma generated over a lower cathode, i.e., the wafer stage, was examined qualitatively by optical emission spectroscopy and compared to the results of Ar plasma measured by a similar method. Optical emission intensities (OEIs) of O (or Ar) atoms and O (or Ar) ions over the lower cathode were increased with each rf power. By increasing the upper cathode rf power (UPRF), a remarkable increase of OEI was observed at approximately 180° of the phase difference of two synchronous rf powers supplied to two cathodes, but there was a slight increase observed at approximately 0°. A lot of negative self-bias voltage was observed at about 180°, but there was little positive voltage observed at approximately 0°. The etch rate of the photoresist was increased with UPRF at 150° without increasing the self-bias voltage of the lower cathode. Highly uniform etching of ±5% was obtained in a 5-in.-diam photoresist wafer etching using a stationary magnetic field. 0.4 μm photoresist lines were etched vertically by using an upper cathode covered by a carbon plate.

  12. Ion beam analysis of fluoride thin films: study of electronic sputtering

    International Nuclear Information System (INIS)

    Pandey, Avinash C.; Kumar, Manvendra

    2013-01-01

    Electronic sputtering is injection of materials from a solid due to impact of energetic ions in electronic energy loss regime. Electronic sputtering process in nanometric flouride (LiF, CaF 2 and BaF 2 ) thin films has been studied using different ion beam analysis techniques such as Recoil Detection Analysis (ERDA), Rutherford Back Scattering (RBS), and Quadrupole Mass Spectrometer (QMS), Electronic sputter yield, number of sputtered atoms per incidence ion, is deduced from the difference in the thickness/areal concentration in the virgin and sputtered films. A Large Area Position Sensitive Detector Telescope (LAPSDT) was designed and fabricated for online ERD analysis. The sputtering was performed with 120 MeV Ag ions in equilibrium charge state (25+) and at an incidence angle of 20° for online ERD measurements, while part of the film (half part of the films was masked to keep it as virgin film) were irradiated at different fluences for RBS measurements. Effects of various growth parameters (substrate, thickness and/or grain size) and irradiation environment (irradiation temperature, charge state and ion fluence) on electronic sputtering process were observed. On the other hand, the nature of the sputtered particles was studied by QMS. Further, the ion beam induced modifications were characterised by X-ray diffraction and atomic force microscopy. (author)

  13. Surface Modification of Sputtered Ga. In. 5 Sb hin Films | Ishu ...

    African Journals Online (AJOL)

    Growth of Ga.5In.5Sb thin films was carried out using a in a r.f. magnetron sputtering system on high-purity quartz glasses as a substrate. The target material for the film was grown in the laboratory using Vertical Bridgmen method. The polycrystallinity of the sputtered films were characterized using x-ray diffraction method.

  14. Deposition rates of high power impulse magnetron sputtering: Physics and economics

    International Nuclear Information System (INIS)

    Anders, Andre

    2010-01-01

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.

  15. High temperature oxidation of Ti–48Al–8Cr–2Ag alloy with sputtered ...

    Indian Academy of Sciences (India)

    Administrator

    Abstract. Magnetron-sputter deposition was used to produce a Ti–48Al–8Cr–2Ag (at.%) coating on a cast alloy substrate with the same composition. The oxidation behaviour of the cast Ti–48Al–8Cr–2Ag alloy and its sputtered coating was investigated in air at 1000°C. The resulting scale structures were analyzed in great.

  16. Effect of Hydrogen on Vacancy Formation in Sputtered Cu Films Studied by Positron Annihilation Spectroscopy

    Science.gov (United States)

    Yabuuchi, Atsushi; Kihara, Teruo; Kubo, Daichi; Mizuno, Masataka; Araki, Hideki; Onishi, Takashi; Shirai, Yasuharu

    2013-04-01

    As a part of the LSI interconnect fabrication process, a post-deposition high-pressure annealing process is proposed for embedding copper into trench structures. The embedding property of sputtered Cu films has been recognized to be improved by adding hydrogen to the sputtering argon gas. In this study, to elucidate the effect of hydrogen on vacancy formation in sputtered Cu films, normal argon-sputtered and argon-hydrogen-sputtered Cu films were evaluated by positron annihilation spectroscopy. As a result, monovacancies with a concentration of more than 10-4 were observed in the argon-hydrogen-sputtered Cu films, whereas only one positron lifetime component corresponding to the grain boundary was detected in the normal argon-sputtered Cu films. This result means monovacancies are stabilized by adding hydrogen to sputtering gas. In the annealing process, the stabilized monovacancies began clustering at around 300 °C, which indicates the dissociation of monovacancy-hydrogen bonds. The introduced monovacancies may promote creep deformation during high-pressure annealing.

  17. Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-11-22

    Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

  18. The stability of cones and pyramids on sputtered surfaces of copper

    International Nuclear Information System (INIS)

    Chadderton, L.T.

    1979-01-01

    Cones and pyramids are formed on surfaces during the sputtering process. The author shows that the death of cones requires neither ion wind perturbations nor the presence of defects, but lies in the more fundamental physics of the sputtering process. (G.T.H.)

  19. Composition changes in sputter deposition of Y-Ba-Cu-O films

    International Nuclear Information System (INIS)

    Hoshi, Y.; Naoe, M.

    1989-01-01

    The authors discuss the mechanism of the composition change in sputter deposition of Y-BA-Cu-O film from YBa 2 Cu 3 O 7-chi target investigated by means of a rf planar magnetron sputtering apparatus. Film composition changes significantly with not only substrate temperature Ts and sputtering gas pressure, but also substrate position. Lack of Cu and Ba content is significant in the film deposited at the substrate position just above the erosion area of the sputtering target. Suppression of bombardment of the substrate surface by negative ions emitted from the target and substrate is effective in increasing Cu and Ba content in the film. These results indicate not only that the sticking probability of the sputtered particles changes with Ts and incident particle energy, but also that high energy particle bombardment of the substrate surface plays an important role in the change of the film composition

  20. Dynamics of the sputtering of water from ice films by collisions with energetic xenon atoms.

    Science.gov (United States)

    Killelea, Daniel R; Gibson, K D; Yuan, Hanqiu; Becker, James S; Sibener, S J

    2012-04-14

    The flow of energy from the impact site of a heavy, translationally energetic xenon atom on an ice surface leads to several non-equilibrium events. The central focus of this paper is on the collision-induced desorption (sputtering) of water molecules into the gas-phase from the ice surface. Sputtering is strongly activated with respect to xenon translational energy, and a threshold for desorption was observed. To best understand these results, we discuss our findings in the context of other sputtering studies of molecular solids. The sputtering yield is quite small; differential measurements of the energy of xenon scattered from ice surfaces show that the ice efficiently accommodates the collisional energy. These results are important as they quantitatively elucidate the dynamics of such sputtering events, with implications for energetic non-equilibrium processes at interfaces.

  1. Sputtering yields of carbon based materials under high particle flux with low energy

    International Nuclear Information System (INIS)

    Nakamura, K.; Nagase, A.; Dairaku, M.; Akiba, M.; Araki, M.; Okumura, Y.

    1995-01-01

    A new ion source which can produce high particle flux beams at low energies has been developed. This paper presents preliminary results on the sputtering yield of the carbon fiber reinforced composites (CFCs) measured with the new ion source. The sputtering yields of 1D and 2D CFCs, which are candidate materials for the divertor armour tiles, have been measured by the weight loss method under the hydrogen and deuterium particle fluxes of 2 similar 7x10 20 /m 2 s at 50 similar 150 eV. Preferential sputtering of the matrix was observed on CFCs which included the matrix of 40 similar 60 w%. The energy dependence of the sputtering yields was weak. The sputtering yields of CFCs normally irradiated with deuterium beam were from 0.073 to 0.095, and were around three times larger than those with hydrogen beam. ((orig.))

  2. Sputtering yields of carbon based materials under high particle flux with low energy

    Science.gov (United States)

    Nakamura, K.; Nagase, A.; Dairaku, M.; Akiba, M.; Araki, M.; Okumura, Y.

    1995-04-01

    A new ion source which can produce high particle flux beams at low energies has been developed. This paper presents preliminary results on the sputtering yield of the carbon fiber reinforced composites (CFCs) measured with the new ion source. The sputtering yields of 1D and 2D CFCs, which are candidate materials for the divertor armour tiles, have been measured by the weight loss method under the hydrogen and deuterium particle fluxes of 2 ˜ 7 × 10 20/m 2 s at 50 ˜ 150 eV. Preferential sputtering of the matrix was observed on CFCs which included the matrix of 40 ˜ 60 w%. The energy dependence of the sputtering yields was weak. The sputtering yields of CFCs normally irradiated with deuterium beam were from 0.073 to 0.095, and were around three times larger than those with hydrogen beam.

  3. Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

    Science.gov (United States)

    Yuan, Xiaohong; Xu, Wenzheng; Huang, Fenglin; Chen, Dongsheng; Wei, Qufu

    2016-12-01

    Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag2O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

  4. Helium and hydrogen trapping in tungsten deposition layers formed by helium plasma sputtering

    International Nuclear Information System (INIS)

    Katayama, K.; Imaoka, K.; Okamura, T.; Nishikawa, M.

    2007-01-01

    Tungsten deposition layers were formed by helium plasma sputtering utilizing a capacitively coupled RF plasma. For comparison, hydrogen plasma was also used for the formation of the deposition layer. It was found that non-negligible amount of helium and hydrogen were trapped in the tungsten deposition layer formed helium plasma sputtering. It is considered that the hydrogen emitted from the plasma chamber wall by helium plasma discharge was trapped in the layer. Atomic ratio of helium to tungsten (He/W) in the layer was estimated to be 0.08. This value is not quite small compared with that of hydrogen in the tungsten deposition layer formed by hydrogen plasma sputtering. The release behavior of helium from the layer formed by helium plasma sputtering was similar to that of hydrogen from the layer formed by hydrogen plasma sputtering

  5. Copper current collectors reduce long-term fouling of air cathodes in microbial fuel cells

    KAUST Repository

    Myung, Jaewook

    2018-02-05

    Long-term operation of wastewater-fed, microbial fuel cells (MFCs) with cathodes made of activated carbon and stainless steel (SS) current collectors can result in decreased performance due to cathode fouling. Copper has good antimicrobial properties, and it is more electrically conductive than SS. To demonstrate that a copper current collector could produce a more fouling resistant cathode, MFCs with air cathodes using either SS or copper current collectors were operated using domestic wastewater for 27 weeks. The reduction in biofouling over time was shown by less biofilm formation on the copper cathode surface compared to SS cathodes, due to the antimicrobial properties of copper. Maximum power densities from 17–27 weeks were 440 ± 38 mW/m2 using copper and 370 ± 21 mW/m2 using SS cathodes. The main difference in the microbial community was a nitrifying community on the SS cathodes, which was not present on the copper cathodes.

  6. Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field

    Science.gov (United States)

    Xin, SONG; Qing, WANG; Zeng, LIN; Puhui, ZHANG; Shuhao, WANG

    2018-02-01

    This paper investigates the magnetic field component impact on cathode spots motion trajectory and the mechanism of periodic contraction. Electromagnetic coils and permanent magnets were installed at the different sides of cathode surface, the photographs of cathode spots motion trajectory were captured by a camera. Increasing the number of magnets and decreasing the distance between magnets and cathode both lead to enhancing cathode spots motion velocity. Radii of cathode spots trajectory decrease gradually with the increasing of electromagnetic coil’s current, from 40 mm at 0 A to 10 mm at 2.7 A. Parallel magnetic field component intensity influence the speed of cathode spots rotate motion, and perpendicular magnetic field component drives spots drift in the radial direction. Cathode spot’s radial drift is controlled by changing the location of the ‘zero line’ where perpendicular magnetic component shifts direction and the radius of cathode spots trajectory almost equal to ‘zero line’.

  7. A new thin film deposition process by cathodic plasma electrolysis

    International Nuclear Information System (INIS)

    Paulmier, T.; Kiriakos, E.; Bell, J.; Fredericks, P.

    2004-01-01

    Full text: A new technique, called atmospheric pressure plasma deposition (APPD), has been developed since a few years for the deposition of carbon and DLC, Titanium or Silicon films on metal and metal alloys substrates. A high voltage (2kV) is applied in a liquid electrolytic solution between an anode and a cathode, both electrodes being cylindrical: a glow discharge is then produced and confined at the vicinity of the cathode. The physic of the plasma in the electrolytic solution near the cathode is very different form the other techniques of plasma deposition since the pressure is here close to the atmospheric pressure. We describe here the different physico-chemical processes occurring during the process. In this cathodic process, the anodic area is significantly larger than the cathode area. In a first step, the electrolytic solution is heated by Joule effect induced by the high voltage between the electrodes. Due to the high current density, the vaporization of the solution occurs near the cathode: a large amount of bubbles are produced which are stabilized at the electrode by hydrodynamic and electromagnetic forces, forming a vapour sheath. The electric field and voltage drop are then concentrated in this gas envelope, inducing the ionization of the gas and the ignition of a glow discharge at the surface of the material. This plasma induces the formation of ionized and reactive species which diffuse and are accelerated toward the cathode. These excited species are the precursors for the formation of the deposition material. At the same time, the glow discharge interacts with the electrolyte solution inducing also ionization, convection and polymerization processes in the liquid: the solution is therefore a second source of the deposition material. A wide range of films have been deposited with a thickness up to 10 micrometers. These films have been analyzed by SEM and Raman spectroscopy. The electrolytic solution has been characterized by GC-MS and the

  8. Microstructure and Electrical Properties of Antimony Telluride Thin Films Deposited by RF Magnetron Sputtering on Flexible Substrate Using Different Sputtering Pressures

    Science.gov (United States)

    Khumtong, T.; Sukwisute, P.; Sakulkalavek, A.; Sakdanuphab, R.

    2017-05-01

    The microstructural, electrical, and thermoelectric properties of antimony telluride (Sb2Te3) thin films have been investigated for thermoelectric applications. Sb2Te3 thin films were deposited on flexible substrate (polyimide) by radiofrequency (RF) magnetron sputtering from a Sb2Te3 target using different sputtering pressures in the range from 4 × 10-3 mbar to 1.2 × 10-2 mbar. The crystal structure, [Sb]:[Te] ratio, and electrical and thermoelectric properties of the films were analyzed by grazing-incidence x-ray diffraction (XRD) analysis, energy-dispersive x-ray spectroscopy (EDS), and Hall effect and Seebeck measurements, respectively. The XRD spectra of the films demonstrated polycrystalline structure with preferred orientation of (015), (110), and (1010). A high-intensity spectrum was found for the film deposited at lower sputtering pressure. EDS analysis of the films revealed the effects of the sputtering pressure on the [Sb]:[Te] atomic ratio, with nearly stoichiometric films being obtained at higher sputtering pressure. The stoichiometric Sb2Te3 films showed p-type characteristics with electrical conductivity, carrier concentration, and mobility of 35.7 S cm-1, 6.38 × 1019 cm-3, and 3.67 cm2 V-1 s-1, respectively. The maximum power factor of 1.07 × 10-4 W m-1 K-2 was achieved for the film deposited at sputtering pressure of 1.0 × 10-2 mbar.

  9. Linear stability and instability patterns in ion-sputtered silicon

    Energy Technology Data Exchange (ETDEWEB)

    Madi, Charbel S; Bola George, H; Aziz, Michael J [Harvard School of Engineering and Applied Sciences, Cambridge, MA 02138 (United States)

    2009-06-03

    We study the patterns formed on Ar{sup +} ion-sputtered Si surfaces at room temperature as a function of the control parameters ion energy and incidence angle. We observe the sensitivity of pattern formation to artifacts such as surface contamination and report the procedures we developed to control them. We identify regions in control parameter space where holes, parallel mode ripples and perpendicular mode ripples form, and identify a region where the flat surface is stable. In the vicinity of the boundaries between the stable and pattern-forming regions, called bifurcations, we follow the time dependence from exponential amplification to saturation and examine the amplification rate and the wavelength in the exponential amplification regime. The resulting power laws are consistent with the theory of nonequilibrium pattern formation for a type I (constant wavelength) bifurcation at low angles and for a type II (diverging wavelength) bifurcation at high angles. We discuss the failure of all sputter rippling models to adequately describe these aspects of the simplest experimental system studied, consisting of an elemental, isotropic amorphous surface in the simplest evolution regime of linear stability.

  10. Sputtering effects on mirrors made of different tungsten grades

    Science.gov (United States)

    Voitsenya, V. S.; Ogorodnikova, O. V.; Bardamid, A. F.; Bondarenko, V. N.; Konovalov, V. G.; Lytvyn, P. M.; Marot, L.; Ryzhkov, I. V.; Shtan', A. F.; Skoryk, O. O.; Solodovchenko, S. I.

    2018-03-01

    Because tungsten (W) is used in present fusion devices and it is a reference material for ITER divertor and possible plasma-facing material for DEMO, we strive to understand the response of different W grades to ion bombardment. In this study, we investigated the behavior of mirrors made of four polycrystalline W grades under long-term ion sputtering. Argon (Ar) and deuterium (D) ions extracted from a plasma were used to investigate the effect of projectile mass on surface modification. Depending on the ion fluence, the reflectance measured at normal incidence was very different for different W grades. The lowest degradation rate of the reflectance was measured for the mirror made of recrystallized W. The highest degradation rate was found for one of the ITER-grade W samples. Pre-irradiation of a mirror with 20-MeV W6+ ions, as simulation of neutron irradiation in ITER, had no noticeable influence on reflectance degradation under sputtering with either Ar or D ions.

  11. Magnetron Sputtered Molybdenum Oxide for Application in Polymers Solar Cells

    Science.gov (United States)

    Sendova-Vassileva, M.; Dikov, Hr; Vitanov, P.; Popkirov, G.; Gergova, R.; Grancharov, G.; Gancheva, V.

    2016-10-01

    Thin films of molybdenum oxide were deposited by radio frequency (RF) magnetron sputtering in Ar from a MoO3 target at different deposition power on glass and silicon substrates. The thickness of the films was determined by profilometer measurements and by ellipsometry. The films were annealed in air at temperatures between 200 and 400°C in air. The optical transmission and reflection spectra were measured. The conductivity of the as deposited and annealed films was determined. The crystal structure was probed by Raman spectroscopy. The oxidation state of the surface was studied by X-ray photoelectron spectroscopy (XPS) spectroscopy. The deposition technique described above was used to experiment with MoOx as a hole transport layer (HTL) in polymer solar cells with bulk hetrojunction active layer, deposited by spin coating. The performance of these layers was compared with poly(3,4-ethylenedioxythiophene):polystyrene sulfonate (PEDOT:PSS), which is the standard material used in this role. The measured current-voltage characteristics of solar cells with the structure glass/ITO/HTL/Poly(3-hexyl)thiophene (P3HT):[6,6]-phenyl-C61- butyric acid methyl ester (PCBM)/Al demonstrate that the studied MoOx layer is a good HTL and leads to comparable characteristics to those with PEDOT:PSS. On the other hand the deposition by magnetron sputtering guarantees reliable and repeatable HTLs.

  12. Protective infrared antireflection coating based on sputtered germanium carbide

    Science.gov (United States)

    Gibson, Des; Waddell, Ewan; Placido, Frank

    2011-09-01

    This paper describes optical, durablility and environmental performance of a germanium carbide based durable antireflection coating. The coating has been demonstrated on germanium and zinc selenide infra-red material however is applicable to other materials such as zinc sulphide. The material is deposited using a novel reactive closed field magnetron sputtering technique, offering significant advantages over conventional evaporation processes for germanium carbide such as plasma enhanced chemical vapour deposition. The sputtering process is "cold", making it suitable for use on a wide range of substrates. Moreover, the drum format provide more efficient loading for high throughput production. The use of the closed field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress. Films incorporate low hydrogen content resulting in minimal C-H absorption bands within critical infra-red passbands such as 3 to 5um and 8 to 12um. Tuning of germanium carbide (Ge(1-x)Cx) film refractive index from pure germanium (refractive index 4) to pure germanium carbide (refractive index 1.8) will be demonstrated. Use of film grading to achieve single and dual band anti-reflection performance will be shown. Environmental and durability levels are shown to be suitable for use in harsh external environments.

  13. Fundamental properties of secondary negative ion emission by sputtering

    International Nuclear Information System (INIS)

    Shimizu, Toshiki; Tsuji, Hiroshi; Ishikawa, Junzo

    1989-01-01

    The report describes some results obtained from preliminary experiments on secondary negative ion emission from a cesiated surface by Xe-ion beam sputtering, which give the production probability. A measuring system is constructed for secondary negative ion emission. The system consists of a microwave ion source with a lens, a sputtering target holder with a heater, a cesium oven, a limiting aperture with a substrate for deposition, a negative-ion extractor and lens, and a ExB type mass separator. Observations are made on the dependence of negative ion current on cesium supply, dependence of negative ion current on target temperature, and negative ion production probability. The cesium supply and the target temperature are found to strongly influence the negative ion emission. By controlling these factors, the optimum condition for secondary negative ion emission is achieved with a minimum surface work function. The production probability of the negative ion is found to be very high, about 20% for carbon. Therefore, the secondary negative ion emission is considered a useful and highly efficient method to obtain high current ion beams. The constant in the Rasser's theoretical equation is experimentally determined to be 4.1 x 10 -4 eV sec/m. (N.K.)

  14. Depth resolution and preferential sputtering in depth profiling of sharp interfaces

    Energy Technology Data Exchange (ETDEWEB)

    Hofmann, S. [Max Planck Institute for Intelligent Systems (formerly MPI for Metals Research), Heisenbergstrasse 3, D-70569 Stuttgart (Germany); Han, Y.S. [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China); Wang, J.Y., E-mail: wangjy@stu.edu.cn [Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063 Guangdong (China)

    2017-07-15

    Highlights: • Interfacial depth resolution from MRI model depends on sputtering rate differences. • Depth resolution critically depends on the dominance of roughness or atomic mixing. • True (depth scale) and apparent (time scale) depth resolutions are different. • Average sputtering rate approximately yields true from apparent depth resolution. • Profiles by SIMS and XPS are different but similar to surface concentrations. - Abstract: The influence of preferential sputtering on depth resolution of sputter depth profiles is studied for different sputtering rates of the two components at an A/B interface. Surface concentration and intensity depth profiles on both the sputtering time scale (as measured) and the depth scale are obtained by calculations with an extended Mixing-Roughness-Information depth (MRI)-model. The results show a clear difference for the two extreme cases (a) preponderant roughness and (b) preponderant atomic mixing. In case (a), the interface width on the time scale (Δt(16–84%)) increases with preferential sputtering if the faster sputtering component is on top of the slower sputtering component, but the true resolution on the depth scale (Δz(16–84%)) stays constant. In case (b), the interface width on the time scale stays constant but the true resolution on the depth scale varies with preferential sputtering. For similar order of magnitude of the atomic mixing and the roughness parameters, a transition state between the two extremes is obtained. While the normalized intensity profile of SIMS represents that of the surface concentration, an additional broadening effect is encountered in XPS or AES by the influence of the mean electron escape depth which may even cause an additional matrix effect at the interface.

  15. Electron and ion kinetics in a micro hollow cathode discharge

    International Nuclear Information System (INIS)

    Kim, G J; Iza, F; Lee, J K

    2006-01-01

    Electron and ion kinetics in a micro hollow cathode discharge are investigated by means of two-dimensional axisymmetric particle-in-cell Monte Carlo collision simulations. Argon discharges at 10 and 300 Torr are studied for various driving currents. Electron and ion energy probability functions (IEPF) are shown at various times and locations to study the spatio-temporal behaviour of the discharge. The electron energy probability function (EEPF) evolves from the Druyvesteyn type in the early stages of the discharge into a two (or three) temperature distribution when steady state is reached. In steady state, secondary electrons accelerated across the cathode fall populate the high energy tail of the EEPF while the low energy region is populated by trapped electrons. The IEPF evolves from a Maxwellian in the negative glow (bulk) to a two temperature distribution on the cathode surface. The overpopulation of low energy ions near the cathode surface is attributed to a larger collision cross section for low energy ions and ionization within the cathode fall

  16. Electron and ion kinetics in a micro hollow cathode discharge

    Energy Technology Data Exchange (ETDEWEB)

    Kim, G J; Iza, F; Lee, J K [Electronics and Electrical Engineering Department, Pohang University of Science and Technology, Pohang, 790-784 (Korea, Republic of)

    2006-10-21

    Electron and ion kinetics in a micro hollow cathode discharge are investigated by means of two-dimensional axisymmetric particle-in-cell Monte Carlo collision simulations. Argon discharges at 10 and 300 Torr are studied for various driving currents. Electron and ion energy probability functions (IEPF) are shown at various times and locations to study the spatio-temporal behaviour of the discharge. The electron energy probability function (EEPF) evolves from the Druyvesteyn type in the early stages of the discharge into a two (or three) temperature distribution when steady state is reached. In steady state, secondary electrons accelerated across the cathode fall populate the high energy tail of the EEPF while the low energy region is populated by trapped electrons. The IEPF evolves from a Maxwellian in the negative glow (bulk) to a two temperature distribution on the cathode surface. The overpopulation of low energy ions near the cathode surface is attributed to a larger collision cross section for low energy ions and ionization within the cathode fall.

  17. Cathodic Protection Design Algorithms for Refineries Aboveground Storage Tanks

    Directory of Open Access Journals (Sweden)

    Kosay Abdul sattar Majbor

    2017-12-01

    Full Text Available Storage tanks condition and integrity is maintained by joint application of coating and cathodic protection. Iraq southern region rich in oil and petroleum product refineries need and use plenty of aboveground storage tanks. Iraq went through conflicts over the past thirty five years resulting in holding the oil industry infrastructure behind regarding maintenance and modernization. The primary concern in this work is the design and implementation of cathodic protection systems for the aboveground storage tanks farm in the oil industry. Storage tank external base area and tank internal surface area are to be protected against corrosion using impressed current and sacrificial anode cathodic protection systems. Interactive versatile computer programs are developed to provide the necessary system parameters data including the anode requirements, composition, rating, configuration, etc. Microsoft-Excel datasheet and Visual Basic.Net developed software were used throughout the study in the design of both cathodic protection systems. The case study considered in this work is the eleven aboveground storage tanks farm situated in al-Shauiba refinery in southern IRAQ. The designed cathodic protection systems are to be installed and monitored realistically in the near future. Both systems were designed for a life span of (15-30 years, and all their parameters were within the internationally accepted standards.

  18. Ethanol tolerant Pt-alloy cathodes for DEFC applications

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez Valera, F.J. [CINVESTAV Unidad Saltillo, Coahuila (Mexico). Grupo de Recursos Minerales y Energeticos; Savadogo, O. [Ecole Polytechnique de Montreal, Montreal, PQ (Canada). Laboratoire de nouveaux materiaux pour l' energie et l' electrochimie

    2008-07-01

    Direct ethanol fuel cells (DEFCs) based on Ru/C cathodes have interesting current density versus cell voltage behaviour. In particular, the selectivity towards the oxygen reduction reaction (ORR) in acid medium in the presence of ethanol was improved when this cathode material was used. This study quantified the degree of tolerance to ethanol and the electrocatalytic activity for the ORR. It compared the specific activity towards the ORR for Pt1Co1/C and Pt3Cr1/C. The study showed that these cathodes have a high tolerance to this alcohol and demonstrated the good performance of this type of Pt-alloy in a DEFC as oxygen reduction cathodes. The performance of the Pt1Co1/C alloy was shown to be better than the Pt3Cr1/C, even when the former had a lower Pt content. The enhanced catalytic behaviour of the PtCo/C alloy can be attributed to the higher degree of allying or a smaller mean particle size and a larger surface area. Polarization measurements with relatively high ethanol concentrations confirmed the good catalytic behaviour of the PtCo/C alloy as cathode in a DEFC operating at 90 degrees C. Current work is focusing on the variation of Co content in the alloy structure and the analysis of this change in terms of ORR activity, tolerance to ethanol and electrochemical behaviour in a DEFC. 10 refs., 5 figs.

  19. A new large-scale plasma source with plasma cathode

    International Nuclear Information System (INIS)

    Yamauchi, K.; Hirokawa, K.; Suzuki, H.; Satake, T.

    1996-01-01

    A new large-scale plasma source (200 mm diameter) with a plasma cathode has been investigated. The plasma has a good spatial uniformity, operates at low electron temperature, and is highly ionized under relatively low gas pressure of about 10 -4 Torr. The plasma source consists of a plasma chamber and a plasma cathode generator. The plasma chamber has an anode which is 200 mm in diameter, 150 mm in length, is made of 304 stainless steel, and acts as a plasma expansion cup. A filament-cathode-like plasma ''plasma cathode'' is placed on the central axis of this source. To improve the plasma spatial uniformity in the plasma chamber, a disk-shaped, floating electrode is placed between the plasma chamber and the plasma cathode. The 200 mm diameter plasma is measure by using Langmuir probes. As a result, the discharge voltage is relatively low (30-120 V), the plasma space potential is almost equal to the discharge voltage and can be easily controlled, the electron temperature is several electron volts, the plasma density is about 10 10 cm -3 , and the plasma density is about 10% variance in over a 100 mm diameter. (Author)

  20. Prediction of the cathodic arc root behaviour in a hollow cathode thermal plasma torch

    International Nuclear Information System (INIS)

    Freton, Pierre; Gonzalez, Jean-Jacques; Escalier, Gaelle

    2009-01-01

    The upper part of a well type cathode (WTC) plasma torch is modelled for several conditions in an air medium in the presence of an electric arc. The plasma flow created by the electric arc is described and the results compared with the data from the literature. Special attention is paid to the description of arc root attachment and to its movement due to the balance of forces. A fine description of the magnetic field produced by the external solenoid is reported. The model is based on the Fluent software implemented with specific developments to be adapted to the thermal plasma domain. The paper shows the necessity to provide an accurate description of the external magnetic field due to the strong influence of the radial magnetic field component. Overall, we propose an original approach for arc root movement description which contributes to the understanding of the flow behaviour in the WTC torch.

  1. Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model

    International Nuclear Information System (INIS)

    Evans, T.E.; Loh, Y.S.; West, W.P.; Finkenthal, D.F.

    1997-11-01

    The MCI transport model was used to compare chemical and physical sputtering for a DIII-D divertor plasma near detachment. With physical sputtering alone the integrated carbon influx was 8.4 x 10 19 neutral/s while physical plus chemical sputtering produced an integrated carbon influx of 1.7 x 10 21 neutrals/s. The average carbon concentration in the computational volume increased from 0.012% with only physical sputtering to 0.182% with both chemical and physical sputtering. This increase in the carbon inventory produced more radiated power which is in better agreement with experimental measurements

  2. The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces

    International Nuclear Information System (INIS)

    Bogaerts, Annemie; Gijbels, Renaat

    2002-01-01

    The effect of the ion- and atom-induced secondary electron emission yields for both 'clean' and 'dirty' cathode surfaces is investigated by means of a hybrid model, for typical conditions used in analytical direct current glow discharges (i.e. a pressure of 50-100 Pa, a voltage of 600-1200 V, and an electrical current of 1-10 mA). The hybrid model consists of a number of Monte Carlo models for fast electrons, fast argon ions and atoms in the cathode dark space, and sputtered copper atoms, a fluid model for slow electrons and argon ions, and a heat transfer model to calculate the gas temperature. For clean surfaces, secondary electron emission is almost exclusively attributed to argon ions, at the conditions under study. For dirty surfaces, on the other hand, fast argon ions and atoms contribute each about 50% to secondary electron emission, at the same discharge conditions. A so-called 'apparent' secondary electron emission yield (i.e. per bombarding ion) is determined for the range of conditions under study. This value for clean surfaces was found equal to 0.07 for argon on a copper cathode, at all conditions investigated; for dirty surfaces, this value was always higher than 0.07 and it strongly depends on the discharge conditions. With these data, current-voltage-pressure characteristics have been calculated for both clean and dirty surfaces, and compared to experimental data. The absolute current values differ by a factor of 1-1.6 between clean and dirty surfaces. However, both calculated currents show more or less the same rise with voltage as the experimental data, in spite of the different behaviour of secondary electron emission yields for clean and dirty surfaces as a function of voltage

  3. GAS FLOW CONTROL SYSTEM IN REACTIVE MAGNETRON SPUTTERING TECHNOLOGY

    Directory of Open Access Journals (Sweden)

    I. M. Klimovich

    2015-01-01

    Full Text Available  It is known that the discharge parameters and the chemical composition of the particles flux impinging onto the substrate during a reactive magnetron sputtering are unstable. As a result spontaneous transitions between the «metal» mode of the target surface and the «poisoned» mode of the target surface have been observed. This leads to nonrepeatability of the coating compositions from process to process. The aim of this work is to design a gas flow control system for reactive sputtering processes. The control system allows to maintain a steady nonequilibrium state of the magnetron discharge in transition mode where the chemical state of the target surface is unstable. The intensities of spectral lines of the discharge spectrum are proposed as control parameters. Photodiode detectors were used for registration of intensities of spectral lines. A gas flow control system regulates argon and reactive gas flow automatically, using feedback signals from photodiode detectors on the intensities of the spectral lines, vacuum gauge, ion current sensor, sensors of discharge current and voltage. As an example, the process of reactive magnetron Ti-Al-N deposition is considered. The following discharge parameters are controlled during sputtering a composite target based on Ti with Al cylindrical inserts: current, voltage, total pressure of a gas mixture, substrate temperature, bias voltage and current of the substrate. Nitrogen flow was controlled by the spectral line intensity of titanium TiI 506,5 nm. The value of the line intensity is connected with the value of reactivity. Elemental composition and structure of the Ti-Al-N coatings were studied using Rutherford backscattering spectroscopy, scanning electron microscopy and X-ray diffraction. It was found, that stoichiometric Ti-Al-N coatings have a globular structure, enhanced hardness and low friction coefficient in contrast to Ti-Al-N coatings with nonstoichiometric composition, which have a

  4. An interchangeable-cathode vacuum arc plasma source

    Science.gov (United States)

    Olson, David K.; Peterson, Bryan G.; Hart, Grant W.

    2010-01-01

    A simplified vacuum arc design [based on metal vapor vacuum arc (MeVVA) concepts] is employed as a plasma source for a study of a B7e non-neutral plasma. The design includes a mechanism for interchanging the cathode source. Testing of the plasma source showed that it is capable of producing on the order of 1012 charges at confinable energies using a boron-carbide disk as the cathode target. The design is simplified from typical designs for lower energy and lower density applications by using only the trigger spark rather than the full vacuum arc in high current ion beam designs. The interchangeability of the cathode design gives the source the ability to replace only the source sample, simplifying use of radioactive materials in the plasma source. The sample can also be replaced with a completely different conductive material. The design can be easily modified for use in other plasma confinement or full MeVVA applications.

  5. Note: Improved heater design for high-temperature hollow cathodes.

    Science.gov (United States)

    McDonald, M S; Gallimore, A D; Goebel, D M

    2017-02-01

    We present an improved heater design for thermionic cathodes using a rhenium filament encased in a boron nitride ceramic sleeve. This heater is relatively simple to fabricate, yet has been successfully used to reliably and repeatably light a lanthanum hexaboride (LaB6) hollow cathode based on a previously published design without noticeable filament degradation over hundreds of hours of operation. The high decomposition temperature of boron nitride (2800 C for inert environments) and melting point for rhenium (3180 C) make this heater especially attractive for use with LaB6, which may require operating temperatures upwards of 1700 C. While boron nitride decomposes in air above 1000 C, the heater was used only at vacuum with an inert gas discharge, and no degradation was observed. Limitations of current state of the art cathode heaters are also discussed and compared with the rhenium-boron nitride combination.

  6. Metallocene-based nanocomposites as cathode materials in lithium batteries

    Energy Technology Data Exchange (ETDEWEB)

    Prakash, Raju; Wall, Clemens; Fichtner, Maximilian [Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

    2010-07-01

    Lithium-ion batteries have been the most utilized batteries in the portable electronic market since many years. But their performance still lies behind the demands of the consumer. New electrode materials with high specific capacities are necessary to meet these demands. Metal fluorides have high theoretical specific capacity based on a novel conversion mechanism, making them promising cathode materials for high performance lithium-ion batteries. However, the metal fluoride cathodes are still hampered by loss of capacity and cyclic instability. Hence, a new approach such as encapsulation of active materials in nanotubes or carbon-coating, etc. is needed in order to improve their performance. Herein, we present a simple method based on the thermal decomposition of a metallocene/LiF mixture to produce inexpensive cathode materials which exhibit a good cyclic stability and reversibility. The detailed structural investigations of the nanocomposites as well as their electrochemical performances are presented.

  7. Measurement and analysis of thermal photoemission from a dispenser cathode

    Directory of Open Access Journals (Sweden)

    Kevin L. Jensen

    2003-08-01

    Full Text Available Photocathodes for free electron lasers (FELs are required to produce nano-Coulomb pulses in picosecond time scales with demonstrable reliability, lifetime, and efficiency. Dispenser cathodes, traditionally a rugged and long-lived thermionic source, are under investigation to determine their utility as a photocathode and have shown promise. The present study describes theoretical models under development to analyze experimental data from dispenser cathodes and to create predictive time-dependent models to predict their performance as an FEL source. Here, a steady-state model of a dispenser cathode with partial coverage of a low work function coating and surface nonuniformity is developed. Quantitative agreement is found for experimental data, especially with regard to temperature, field, laser intensity, and quantum efficiency versus laser wavelength dependence. In particular, for long wavelength incident lasers of sufficient intensity, the majority of the absorbed energy heats the electron gas and background lattice, and photoemission from the heated electron distribution constitutes the emitted current.

  8. Durability and Performance of High Performance Infiltration Cathodes

    DEFF Research Database (Denmark)

    Samson, Alfred Junio; Søgaard, Martin; Hjalmarsson, Per

    2013-01-01

    The performance and durability of solid oxide fuel cell (SOFC) cathodes consisting of a porous Ce0.9Gd0.1O1.95 (CGO) infiltrated with nitrates corresponding to the nominal compositions La0.6Sr0.4Co1.05O3-δ (LSC), LaCoO3-δ (LC), and Co3O4 are discussed. At 600°C, the polarization resistance, Rp......, varied as: LSC (0.062Ωcm2)originate...... of the infiltrate but also from a better surface exchange property. A 450h test of an LSC-infiltrated CGO cathode showed an Rp with final degradation rate of only 11mΩcm2kh-1. An SOFC with an LSC-infiltrated CGO cathode tested for 1,500h at 700°C and 0.5Acm-2 (60% fuel, 20% air utilization) revealed no measurable...

  9. A Transient Model for Fuel Cell Cathode-Water Propagation Behavior inside a Cathode after a Step Potential

    Directory of Open Access Journals (Sweden)

    Der-Sheng Chan

    2010-04-01

    Full Text Available Most of the voltage losses of proton exchange membrane fuel cells (PEMFC are due to the sluggish kinetics of oxygen reduction on the cathode and the low oxygen diffusion rate inside the flooded cathode. To simulate the transient flooding in the cathode of a PEMFC, a transient model was developed. This model includes the material conservation of oxygen, vapor, water inside the gas diffusion layer (GDL and micro-porous layer (MPL, and the electrode kinetics in the cathode catalyst layer (CL. The variation of hydrophobicity of each layer generated a wicking effect that moves water from one layer to the other. Since the GDL, MPL, and CL are made of composite materials with different hydrophilic and hydrophobic properties, a linear function of saturation was used to calculate the wetting contact angle of these composite materials. The balance among capillary force, gas/liquid pressure, and velocity of water in each layer was considered. Therefore, the dynamic behavior of PEMFC, with saturation transportation taken into account, was obtained in this study. A step change of the cell voltage was used to illustrate the transient phenomena of output current, water movement, and diffusion of oxygen and water vapor across the entire cathode.

  10. Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Xiaohong, E-mail: yxhong1981_2004@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Xu, Wenzheng, E-mail: xwz8199@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Huang, Fenglin, E-mail: windhuang325@163.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Chen, Dongsheng, E-mail: mjuchen@126.com [Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Wei, Qufu, E-mail: qfwei@jiangnan.edu.cn [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China)

    2016-12-30

    Highlights: • Ag/ZnO composite film was successfully deposited on polyester fabric by magnetron sputtering technique. • Ag film was easily oxidized into Ag{sub 2}O film in high vacuum oxygen environment. • The zinc film coated on the surface of Ag film before RF reactive sputtering could protect the silver film from oxidation. • Polyester fabric coated with Ag/ZnO composite film can obtained structural color. • The anti-ultraviolet and antistatic properties of polyester fabric coated with Ag/ZnO composite film all were good. - Abstract: Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag{sub 2}O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

  11. Changes in X-ray photoelectron spectra of yttria-tetragonal zirconia polycrystal by ion sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Watanabe, Eiko; Yoshinari, Masao [Tokyo Dental College, Oral Health Science Center, Tokyo, Chiyoda-ku (Japan)

    2016-04-15

    This paper reports changes in X-ray photoelectron spectroscopy spectra of yttria-tetragonal zirconia polycrystal (Y-TZP) brought about by Ar ion sputtering. The changes in the core-level spectra of Y-TZP suggest that preferential sputtering of oxygen occurred. A new peak was observed near 0 eV binding energy accompanied with changes in the core-level spectra by the sputtering. After 18 h in a high vacuum following the sputtering, the spectra changed by the sputtering were returned to their original shapes. In contrast, the color of Y-TZP was changed from white to pale brown by X-ray irradiation and was changed from pale brown to dark gray by ion sputtering. However, when the new peak near 0 eV decreased after 18 h, no color change was observed. Therefore, it is thought that the new peak was mainly derived from electrons trapped in various kinds of oxygen vacancies created by the sputtering in other than color centers. (orig.)

  12. Shape memory effect and microstructures of sputter-deposited Cu-Al-Ni films

    International Nuclear Information System (INIS)

    Minemura, T.; Andoh, H.; Kita, Y.; Ikuta, I.

    1985-01-01

    The shape memory effect has been found in many alloy systems which exhibit a thermoelastic martensite transformation. Cu-Al-Ni alloys exhibit an excellent shape memory effect in single crystalline states, but they have not yet been commercially used due to their brittle fracture along the grain boundaries in polycrystalline states. This letter reports the shape memory effect and microstructures of the sputter-deposited Cu-Al-Ni films. Cu-14%Al-4%Ni alloy ingot was prepared. A target for sputter deposition was cut from the ingot. Aluminium foils (20 μm thick) were used for the substrates of sputter deposition. The microstructures and crystal structures of the films were investigated by transmission electron microscopy (TEM) and X-ray diffraction using CuKα radiation, respectively. The effect of the sputtering conditions such as substrate temperature, partial pressure of argon gas, and the sputtering power on the structures of sputter-deposited Cu-14%Al-4%Ni films were investigated by X-ray diffraction. Results are shown and discussed. Photographs demonstrate shape memory behaviour of Cu-14%Al-4%Ni films sputter-deposited on aluminium foils from (a) liquid nitrogen temperature to (d) room temperature. (author)

  13. Back bombardment for dispenser and lanthanum hexaboride cathodes

    Directory of Open Access Journals (Sweden)

    Mahmoud Bakr

    2011-06-01

    Full Text Available The back bombardment (BB effect limits wide usage of thermionic rf guns. The BB effect induces not only ramping-up of a cathode’s temperature and beam current, but also degradation of cavity voltage and beam energy during a macropulse. This paper presents a comparison of the BB effect for the case of dispenser tungsten-base (DC and lanthanum hexaboride (LaB_{6} thermionic rf gun cathodes. For each, particle simulation codes are used to simulate the BB effect and electron beam dynamics in a thermionic rf gun cathode. A semiempirical equation is also used to investigate the stopping range and deposited heat power of BB electrons in the cathode material. A numerical simulation method is used to calculate the change of the cathode temperature and current density during a single macropulse. This is done by solving two differential equations for the rf gun cavity equivalent circuit and one-dimensional thermal diffusion equation. High electron emission and small beam size are required for generation of a high-brightness electron beam, and so in this work the emission properties of the cathode are taken into account. Simulations of the BB effect show that, for a pulse of 6  μs duration, the DC cathode experiences a large change in the temperature compared with LaB_{6}, and a change in current density 6 times higher. Validation of the simulation results is performed using experimental data for beam current beyond the gun exit. The experimental data is well reproduced using the simulation method.

  14. Deposition of SiOx thin films on Y-TZP by reactive magnetron sputtering: influence of plasma parameters on the adhesion properties between Y-TZP and resin cement for application in dental prosthesis

    Directory of Open Access Journals (Sweden)

    José Renato Calvacanti de Queiroz

    2011-01-01

    Full Text Available In this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS, optical microscopy and scanning electron microscopy (SEM. Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O2 increased the bond strength to (32.8 ± 5.4 MPa. This value has not been achieved by traditional methods.

  15. Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Hyun-Ju [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Jeong, Yong-Hoon [Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Prosthodontics and Restorative Science, College of Dentistry, The Ohio State University, Columbus, OH (United States)

    2014-12-01

    The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO{sub 3}){sub 2} + 3 mM NH{sub 4}H{sub 2}PO{sub 4}. Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings.

  16. High-Frequency-Induced Cathodic Breakdown during Plasma Electrolytic Oxidation

    Science.gov (United States)

    Nominé, A.; Nominé, A. V.; Braithwaite, N. St. J.; Belmonte, T.; Henrion, G.

    2017-09-01

    The present communication shows the possibility of observing microdischarges under cathodic polarization during plasma electrolytic oxidation at high frequency. Cathodic microdischarges can ignite beyond a threshold frequency found close to 2 kHz. The presence (respectively, absence) of an electrical double layer is put forward to explain how the applied voltage can be screened, which therefore prevents (respectively, promotes) the ignition of a discharge. Interestingly, in the conditions of the present study, the electrical double layer requires between 175 and 260 μ s to form. This situates the expected threshold frequency between 1.92 and 2.86 kHz, which is in good agreement with the value obtained experimentally.

  17. Tandem cathode for proton exchange membrane fuel cells

    DEFF Research Database (Denmark)

    Siahrostami, Samira; Björketun, Mårten E.; Strasser, Peter

    2013-01-01

    The efficiency of proton exchange membrane fuel cells is limited mainly by the oxygen reduction reaction at the cathode. The large cathodic overpotential is caused by correlations between binding energies of reaction intermediates in the reduction of oxygen to water. This work introduces a novel...... reaction intermediate each, and they occur on different catalyst surfaces. As a result they can be optimized independently and the fundamental problem associated with the four-electron catalysis is avoided. A combination of density functional theory calculations and published experimental data is used...

  18. Tolerant chalcogenide cathodes of membraneless micro fuel cells.

    Science.gov (United States)

    Gago, Aldo Saul; Gochi-Ponce, Yadira; Feng, Yong-Jun; Esquivel, Juan Pablo; Sabaté, Neus; Santander, Joaquin; Alonso-Vante, Nicolas

    2012-08-01

    The most critical issues to overcome in micro direct methanol fuel cells (μDMFCs) are the lack of tolerance of the platinum cathode and fuel crossover through the polymer membrane. Thus, two novel tolerant cathodes of a membraneless microlaminar-flow fuel cell (μLFFC), Pt(x)S(y) and CoSe(2), were developed. The multichannel structure of the system was microfabricated in SU-8 polymer. A commercial platinum cathode served for comparison. When using 5 M CH(3)OH as the fuel, maximum power densities of 6.5, 4, and 0.23 mW cm(-2) were achieved for the μLFFC with Pt, Pt(x)S(y), and CoSe(2) cathodes, respectively. The Pt(x)S(y) cathode outperformed Pt in the same fuel cell when using CH(3)OH at concentrations above 10 M. In a situation where fuel crossover is 100 %, that is, mixing the fuel with the reactant, the maximum power density of the micro fuel cell with Pt decreased by 80 %. However, for Pt(x)S(y) this decrease corresponded to 35 % and for CoSe(2) there was no change in performance. This result is the consequence of the high tolerance of the chalcogenide-based cathodes. When using 10 M HCOOH and a palladium-based anode, the μLFFC with a CoSe(2) cathode achieved a maxiumum power density of 1.04 mW cm(-2). This micro fuel cell does not contain either Nafion membrane or platinum. We report, for the first time, the evaluation of Pt(x)S(y)- and CoSe(2)-based cathodes in membraneless micro fuel cells. The results suggest the development of a novel system that is not size restricted and its operation is mainly based on the selectivity of its electrodes. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  19. Improved Cathode Structure for a Direct Methanol Fuel Cell

    Science.gov (United States)

    Valdez, Thomas; Narayanan, Sekharipuram

    2005-01-01

    An improved cathode structure on a membrane/electrode assembly has been developed for a direct methanol fuel cell, in a continuing effort to realize practical power systems containing such fuel cells. This cathode structure is intended particularly to afford better cell performance at a low airflow rate. A membrane/electrode assembly of the type for which the improved cathode structure was developed (see Figure 1) is fabricated in a process that includes brush painting and spray coating of catalyst layers onto a polymer-electrolyte membrane and onto gas-diffusion backings that also act as current collectors. The aforementioned layers are then dried and hot-pressed together. When completed, the membrane/electrode assembly contains (1) an anode containing a fine metal black of Pt/Ru alloy, (2) a membrane made of Nafion 117 or equivalent (a perfluorosulfonic acid-based hydrophilic, proton-conducting ion-exchange polymer), (3) a cathode structure (in the present case, the improved cathode structure described below), and (4) the electrically conductive gas-diffusion backing layers, which are made of Toray 060(TradeMark)(or equivalent) carbon paper containing between 5 and 6 weight percent of poly(tetrafluoroethylene). The need for an improved cathode structure arises for the following reasons: In the design and operation of a fuel-cell power system, the airflow rate is a critical parameter that determines the overall efficiency, cell voltage, and power density. It is desirable to operate at a low airflow rate in order to obtain thermal and water balance and to minimize the size and mass of the system. The performances of membrane/electrode assemblies of prior design are limited at low airflow rates. Methanol crossover increases the required airflow rate. Hence, one way to reduce the required airflow rate is to reduce the effect of methanol crossover. Improvement of the cathode structure - in particular, addition of hydrophobic particles to the cathode - has been

  20. The Impact of Strong Cathodic Polarization on SOC Electrolyte Materials

    DEFF Research Database (Denmark)

    Kreka, Kosova; Hansen, Karin Vels; Jacobsen, Torben

    2016-01-01

    current density. In case of a cell voltage above 1.6 V, p-type and n-type electronic conductivity are often observed at the anode and cathode respectively3. Hence, a considerable part of the current is lost as leakage through the electrolyte, thus lowering the efficiency of the cell considerably....... of impurities at the grain boundaries, electrode poisoning, delamination or cracks of the electrolyte etc., have been observed in cells operated at such conditions, lowering the lifetime of the cell1,2. High polarizations are observed at the electrolyte/cathode interface of an electrolysis cell operated at high...

  1. Nitrogen Glow Discharge by a DC Virtual Cathode

    Science.gov (United States)

    Shager, Azza M.; Sroor, Amany T.; Tayeb, Hoda A. El; Gamal, Hoda A. El; Masoud, Mohamed M.

    2008-08-01

    A DC glow discharge operating with a virtual cathode is studied. The system consists of a solid disc cathode and mesh anode. The discharge occurs in nitrogen gas at the left-hand side of Paschen's curve. The plasma electron density in the axial direction has been found to be 0.2 · 108 cm-3 at 2 cm from the mesh. The electron temperature peak value has been found to be 3.5 eV at 6 cm from the mesh. The radial distribution of the plasma electron density and temperature are discussed. The variation of the plasma parameters are in good agreement with the experimental results.

  2. Web-Based Cathode Strip Chamber Data Display

    CERN Multimedia

    Firmansyah, M

    2013-01-01

    Cathode Strip Chamber (CSC) is a detector that uses gas and high electric field to detect particles. When a particle goes through CSC, it will ionize gas particles and generate electric signal in the anode and cathode of the detector. Analysis of the electric signal data can help physicists to reconstruct path of the particles and determine what happen inside the detector. Using data display, analysis of CSC data becomes easier. One can determine which data is interesting, unusual, or maybe only contain noise.\

  3. Morphological features in aluminum nitride epilayers prepared by magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Stach Sebastian

    2015-03-01

    Full Text Available The aim of this study is to characterize the surface topography of aluminum nitride (AlN epilayers prepared by magnetron sputtering using the surface statistical parameters, according to ISO 25178-2:2012. To understand the effect of temperature on the epilayer structure, the surface topography was investigated through atomic force microscopy (AFM. AFM data and analysis of surface statistical parameters indicated the dependence of morphology of the epilayers on their growth conditions. The surface statistical parameters provide important information about surface texture and are useful for manufacturers in developing AlN thin films with improved surface characteristics. These results are also important for understanding the nanoscale phenomena at the contacts between rough surfaces, such as the area of contact, the interfacial separation, and the adhesive and frictional properties.

  4. Structure of DC sputtered Si-C-N thin films

    Energy Technology Data Exchange (ETDEWEB)

    Radnoczi, G.; Safran, G.; Czigany, Zs.; Berlind, T.; Hultman, L

    2003-09-01

    Si-C-N films of maximum 65 at.% of Si and maximum 40 at.% of N were prepared by reactive magnetron sputtering and their fine structure was investigated by high-resolution transmission electron microscopy. For compositions, where C-C and C-N bonds prevail, the films had anisotropic structure on the atomic scale, composed of curved graphitic layers, aligned parallel to the substrate normal. An isotropic structure was detected in the middle of the compositional triangle. On a larger scale, a columnar morphology, aligned in the direction of the deposition flux was formed in films containing more than 15 at.% of Si. Singular or simultaneous appearance of the above structures depended on film composition.

  5. Classical scattering cross section in sputtering transport theory

    International Nuclear Information System (INIS)

    Zhang Zhulin

    2002-01-01

    For Lindhard scaling interaction potential scattering commonly used in sputtering theory, the authors analyzed the great difference between Sigmund's single power and the double power cross sections calculated. The double power cross sections can give a much better approximation to the Born-Mayer scattering in the low energy region (m∼0.1). In particular, to solve the transport equations by K r -C potential interaction given by Urbassek few years ago, only the double power cross sections (m∼0.1) can yield better approximate results for the number of recoils. Therefore, the Sigmund's single power cross section might be replaced by the double power cross sections in low energy collision cascade theory

  6. Development of AlInN photoconductors deposited by sputtering

    International Nuclear Information System (INIS)

    Nunez-Cascajero, Arantzazu; Jimenez-Rodriguez, Marco; Gonzalez-Herraez, Miguel; Naranjo, Fernando B.; Monroy, Eva

    2017-01-01

    In this work, we have developed photoconductor devices based on Al 0.39 In 0.61 N layers grown on sapphire by reactive radio-frequency magnetron sputtering. The fabricated devices show a sublinear dependence of the photocurrent as a function of the incident optical power. The above-the-band-gap responsivity reaches 7 W/A for an irradiance of 10 W/m 2 (405 nm wavelength). The response decreases smoothly for below-the-bandgap excitation, dropping by more than an order of magnitude at 633 nm. The devices present persistent photoconductivity effects associated to carrier trapping at grain boundaries. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  7. Development of AlInN photoconductors deposited by sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Nunez-Cascajero, Arantzazu; Jimenez-Rodriguez, Marco; Gonzalez-Herraez, Miguel; Naranjo, Fernando B. [Grupo de Ingenieria Fotonica, Departamento de Electronica, Universidad de Alcala, Madrid (Spain); Monroy, Eva [Universite Grenoble-Alpes, Grenoble (France); CEA-Grenoble, INAC-PHELIQS, Grenoble (France)

    2017-09-15

    In this work, we have developed photoconductor devices based on Al{sub 0.39}In{sub 0.61}N layers grown on sapphire by reactive radio-frequency magnetron sputtering. The fabricated devices show a sublinear dependence of the photocurrent as a function of the incident optical power. The above-the-band-gap responsivity reaches 7 W/A for an irradiance of 10 W/m{sup 2} (405 nm wavelength). The response decreases smoothly for below-the-bandgap excitation, dropping by more than an order of magnitude at 633 nm. The devices present persistent photoconductivity effects associated to carrier trapping at grain boundaries. (copyright 2017 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  8. Molecular dynamics simulation of gold cluster growth during sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Abraham, J. W., E-mail: abraham@theo-physik.uni-kiel.de; Bonitz, M., E-mail: bonitz@theo-physik.uni-kiel.de [Institut für Theoretische Physik und Astrophysik, Christian-Albrechts-Universität zu Kiel, Leibnizstraße 15, D-24098 Kiel (Germany); Strunskus, T.; Faupel, F. [Institut für Materialwissenschaft, Lehrstuhl für Materialverbunde, Christian-Albrechts-Universität zu Kiel, Kaiserstraße 2, D-24143 Kiel (Germany)

    2016-05-14

    We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

  9. A cesium-sputtering negative ion source for AMS investigations

    Science.gov (United States)

    Håkansson, K.; Hellborg, R.; Erlandsson, B.; Skog, G.; Stenström, K.; Wiebert, A.

    1996-02-01

    Accelerator mass spectrometry (AMS) requires ion sources delivering intense negative ion beams of high stability. At the Lund 3 MV Pelletron tandem accelerator a new Cs-sputtering source has therefore been constructed and installed. The source is equipped with a mechanism for automatically cracking the cesium galss ampoule inside the oven when the source is evacuated. The source is also equipped with a multiple sample holder which permits on-line sample changing without disrupting the operation of the electrostatic accelerator. In order to maximise the negative ion beam current the sample holder has a mechanism for moving the sample relative to the cesium beam. By doing this the lifetime of the samples can be increased.

  10. Surface sputtering in high-dose Fe ion implanted Si

    International Nuclear Information System (INIS)

    Ishimaru, Manabu

    2007-01-01

    Microstructures and elemental distributions in high-dose Fe ion implanted Si were characterized by means of transmission electron microscopy and Rutherford backscattering spectroscopy. Single crystalline Si(0 0 1) substrates were implanted at 350 deg. C with 120 keV Fe ions to fluences ranging from 0.1 x 10 17 to 4.0 x 10 17 /cm 2 . Extensive damage induced by ion implantation was observed inside the substrate below 1.0 x 10 17 /cm 2 , while a continuous iron silicide layer was formed at 4.0 x 10 17 /cm 2 . It was found that the spatial distribution of Fe projectiles drastically changes at the fluence between 1.0 x 10 17 and 4.0 x 10 17 /cm 2 due to surface sputtering during implantation

  11. Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications.

    Science.gov (United States)

    Reynolds, Glyn J; Kratzer, Martin; Dubs, Martin; Felzer, Heinz; Mamazza, Robert

    2012-04-10

    New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba₀ .96 Ca 0. 04 Ti 0. 82 Zr 0. 18 O₃ (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Film texture and crystallinity were found to depend on both deposition temperature and substrate: above 600 °C, the as-deposited films consisted of well-facetted crystallites with the cubic perovskite structure. A strongly textured Pt (111) underlayer enhanced the (001) orientation of BCZTO films deposited at 900 °C, 10 mtorr pressure and 10% oxygen in argon. Similar films deposited onto a Pt (111) textured film at 700 °C and directly onto (100) Si wafers showed relatively larger (011) and diminished intensity (00ℓ) diffraction peaks. Sputter ambients containing oxygen caused the Ni underlayers to oxidize even at 700 °C: Raising the process temperature produced more diffraction peaks of NiO with increased intensities. Thin-film capacitors were fabricated using ~500 nm thick BCZTO dielectrics and both Pt and Ni top and bottom electrodes. Small signal capacitance measurements were carried out to determine capacitance and parallel resistance at low frequencies and from these data, the relative permittivity (e r ) and resistivity (r) of the dielectric films were calculated; values ranged from ~50 to >2,000, and from ~10⁴ to ~10 10 Ω∙cm, respectively.

  12. Large area precision optical coatings by pulse magnetron sputtering

    Science.gov (United States)

    Frach, Peter; Gloess, Daniel; Goschurny, Thomas; Drescher, Andy; Hartung, Ullrich; Bartzsch, Hagen; Heisig, Andreas; Grune, Harald; Leischnig, Lothar; Leischnig, Steffen; Bundesmann, Carsten

    2017-05-01

    Pulse magnetron sputtering is very well suited for the deposition of optical coatings. Due to energetic activation during film growth, sputtered films are dense, smooth and show an excellent environmental stability. Films of materials like SiO2, Al2O3, Nb2O5 or Ta2O5 can be produced with very little absorption and scattering losses and are well suited for precision optics. FEP's coating plant PreSensLine, a deposition machine dedicated for the development and deposition of precision optical layer systems will be presented. The coating machine (VON ARDENNE) is equipped with dual magnetron systems (type RM by FEP). Concepts regarding machine design, process technology and process control as well as in situ monitoring are presented to realize the high demands on uniformity, accuracy and reproducibility. Results of gradient and multilayer type precision optical coatings are presented. Application examples are edge filters and special antireflective coatings for the backlight of 3D displays with substrate size up to 300 x 400mm. The machine allows deposition of rugate type gradient layers by rotating a rotary table with substrates between two sources of the dual magnetron system. By combination of the precision drive (by LSA) for the substrate movement and a special pulse parameter variation during the deposition process (available with the pulse unit UBS-C2 of FEP), it is possible to adjust the deposition rate as a function of the substrate position exactly. The aim of a current development is a technology for the uniform coating of 3D-substrates and freeform components as well as laterally graded layers.

  13. Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

    Directory of Open Access Journals (Sweden)

    Robert Mamazza

    2012-04-01

    Full Text Available New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba0.96Ca0.04Ti0.82Zr0.18O3 (BCZTO target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD, scanning electron microscopy (SEM and X-ray photoelectron spectroscopy (XPS. Film texture and crystallinity were found to depend on both deposition temperature and substrate: above 600 °C, the as-deposited films consisted of well-facetted crystallites with the cubic perovskite structure. A strongly textured Pt (111 underlayer enhanced the (001 orientation of BCZTO films deposited at 900 °C, 10 mtorr pressure and 10% oxygen in argon. Similar films deposited onto a Pt (111 textured film at 700 °C and directly onto (100 Si wafers showed relatively larger (011 and diminished intensity (00ℓ diffraction peaks. Sputter ambients containing oxygen caused the Ni underlayers to oxidize even at 700 °C: Raising the process temperature produced more diffraction peaks of NiO with increased intensities. Thin-film capacitors were fabricated using ~500 nm thick BCZTO dielectrics and both Pt and Ni top and bottom electrodes. Small signal capacitance measurements were carried out to determine capacitance and parallel resistance at low frequencies and from these data, the relative permittivity (er and resistivity (r of the dielectric films were calculated; values ranged from ~50 to >2,000, and from ~104 to ~1010 Ω∙cm, respectively.

  14. Organic field-effect transistor nonvolatile memories utilizing sputtered C nanoparticles as nano-floating-gate

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Jie; Liu, Chang-Hai; She, Xiao-Jian; Sun, Qi-Jun; Gao, Xu; Wang, Sui-Dong, E-mail: wangsd@suda.edu.cn [Institute of Functional Nano and Soft Materials (FUNSOM), Soochow University, Suzhou, Jiangsu 215123 (China)

    2014-10-20

    High-performance organic field-effect transistor nonvolatile memories have been achieved using sputtered C nanoparticles as the nano-floating-gate. The sputtered C nano-floating-gate is prepared with low-cost material and simple process, forming uniform and discrete charge trapping sites covered by a smooth and complete polystyrene layer. The devices show large memory window, excellent retention capability, and programming/reading/erasing/reading endurance. The sputtered C nano-floating-gate can effectively trap both holes and electrons, and it is demonstrated to be suitable for not only p-type but also n-type organic field-effect transistor nonvolatile memories.

  15. Preparation of metal nanosuspensions by high-pressure DC-sputtering on running liquids

    Energy Technology Data Exchange (ETDEWEB)

    Wagener, M.; Murty, B.S.; Guenther, B. [Fraunhofer-Inst. fuer Angewandte Materialforschung, Bremen (Germany)

    1997-09-01

    A modified VERL-process (vacuum evaporation on running liquids) employing high pressure magnetron sputtering has been used for the preparation of suspensions with metal nanoparticles. The method has been tested for Ag- and Fe-suspensions by varying the pressure of the Argon sputtering atmosphere in the range of 1 to 30 Pa. A narrow particle size distribution with a mean particle size ranging from 5--18 nm has been found. The mean particle size increases with increasing Argon pressure in the pressure range under investigation. A descriptive model for the process of particle formation as a function of sputtering gas pressure is given.

  16. Charge-state related effects in sputtering of LiF by swift heavy ions

    Energy Technology Data Exchange (ETDEWEB)

    Assmann, W. [Ludwig-Maximilians-Universität München, 85748 Garching (Germany); Ban-d' Etat, B. [Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, CEA–CNRS–ENSICAEN–Univ. Caen, 14070 Caen (France); Bender, M. [GSI Helmholtzzentrum für Schwerionenforschung, 64291 Darmstadt (Germany); Boduch, P. [Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, CEA–CNRS–ENSICAEN–Univ. Caen, 14070 Caen (France); Grande, P.L. [Univ. Fed. Rio Grande do Sul, BR-91501970 Porto Alegre, RS (Brazil); Lebius, H.; Lelièvre, D. [Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, CEA–CNRS–ENSICAEN–Univ. Caen, 14070 Caen (France); Marmitt, G.G. [Univ. Fed. Rio Grande do Sul, BR-91501970 Porto Alegre, RS (Brazil); Rothard, H. [Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, CEA–CNRS–ENSICAEN–Univ. Caen, 14070 Caen (France); Seidl, T.; Severin, D.; Voss, K.-O. [GSI Helmholtzzentrum für Schwerionenforschung, 64291 Darmstadt (Germany); Toulemonde, M., E-mail: toulemonde@ganil.fr [Centre de Recherche sur les Ions, les Matériaux et la photonique, CIMAP-GANIL, CEA–CNRS–ENSICAEN–Univ. Caen, 14070 Caen (France); Trautmann, C. [GSI Helmholtzzentrum für Schwerionenforschung, 64291 Darmstadt (Germany); Technische Universität Darmstadt, 64289 Darmstadt (Germany)

    2017-02-01

    Sputtering experiments with swift heavy ions in the electronic energy loss regime were performed by using the catcher technique in combination with elastic recoil detection analysis. The angular distribution of particles sputtered from the surface of LiF single crystals is composed of a jet-like peak superimposed on a broad isotropic distribution. By using incident ions of fixed energy but different charges states, the influence of the electronic energy loss on both components is probed. We find indications that isotropic sputtering originates from near-surface layers, whereas the jet component may be affected by contributions from depth up to about 150 nm.

  17. The sputtering of the deformed gold under irradiation with krypton swift heavy ions

    International Nuclear Information System (INIS)

    Didyk, A.Yu.; Semina, V.K.; Hofman, A.

    2002-01-01

    The results about sputtering yield of gold irradiated by 86 Kr ions with high inelastic energy losses up to a fluence of 10 14 ion/cm 2 are presented. It was shown that the sputtering (evaporation) yield strongly depends on the initial defect concentration in gold. The sputtering yield begins to grow very strongly with the increasing of damage created by heavy ion elastic and inelastic energy losses. The temperature on the surface in the area around krypton ion trajectory is much higher than the melting and evaporation temperatures for gold as follows from calculations with the various expressions and models

  18. Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidence

    International Nuclear Information System (INIS)

    Yamamura, Yasunori; Tawara, Hiro.

    1995-03-01

    The yields of the ion-induced sputtering from monoatomic solids at normal incidence for various ion-target combinations are presented graphically as a function of the incident ion energy. In order to fill the lack of the experimental data, the sputtering yields are also calculated by the Monte Carlo simulation code ACAT for some ion-target combinations. Each graph shows available experimental data points and the ACAT data, together with the sputtering yields calculated by the present empirical formula, whose parameters are determined by the best-fit to available data. (author)

  19. Charge state of sputtered impurity ions near a limiter or divertor in a tokamak

    International Nuclear Information System (INIS)

    Boley, C.D.; Brooks, J.N.; Kim, Y.K.

    1983-03-01

    Many impurity atoms sputtered from a limiter or divertor plate are ionized in the scrapeoff zone and return to the sputtering surface bacause of friction with incoming plasma ions. The final charge state attained by such impurities has been calculated for a variety of plasma edge conditions. The surface materials considered are tungsten, beryllium, beryllium oxide, and carbon. Estimates of the successive ionization cross sections for tungsten are developed. In all cases examined, returning impurity ions are found to be multiply ionized. This implies a significant energy gain in the sheath region, with important implications for self-sputtering of redeposited surface material

  20. Organic field-effect transistor nonvolatile memories utilizing sputtered C nanoparticles as nano-floating-gate

    International Nuclear Information System (INIS)

    Liu, Jie; Liu, Chang-Hai; She, Xiao-Jian; Sun, Qi-Jun; Gao, Xu; Wang, Sui-Dong

    2014-01-01

    High-performance organic field-effect transistor nonvolatile memories have been achieved using sputtered C nanoparticles as the nano-floating-gate. The sputtered C nano-floating-gate is prepared with low-cost material and simple process, forming uniform and discrete charge trapping sites covered by a smooth and complete polystyrene layer. The devices show large memory window, excellent retention capability, and programming/reading/erasing/reading endurance. The sputtered C nano-floating-gate can effectively trap both holes and electrons, and it is demonstrated to be suitable for not only p-type but also n-type organic field-effect transistor nonvolatile memories.

  1. Small sample analysis using sputter atomization/resonance ionization mass spectrometry

    International Nuclear Information System (INIS)

    Christie, W.H.; Goeringer, D.E.

    1986-01-01

    We have used secondary ion mass spectrometry (SIMS) to investigate the emission of ions via argon sputtering from U metal, UO 2 , and U 3 O 8 samples. We have also used laser resonance ionization techniques to study argon-sputtered neutral atoms and molecules emitted from these same samples. For the case of U metal, a significant enhancement in detection sensitivity for U is obtained via SA/RIMS. For U in the fully oxidized form (U 3 O 8 ), SA/RIMS offers no improvement in U detection sensitivity over conventional SIMS when sputtering with argon. 9 refs., 1 fig., 2 tabs

  2. The Sputtering of the Deformed Gold under Irradiation with Krypton Swift Heavy Ions

    CERN Document Server

    Didyk, A Yu; Semina, V K

    2002-01-01

    The results about sputtering yield of gold irradiated by ^{86}Kr ions with high inelastic energy losses up to a fluence of 10^{14} ion/cm^2 are presented. It was shown that the sputtering (evaporation) yield strongly depends on the initial defect concentration in gold. The sputtering yield begins to grow very strongly with the increasing of damage created by heavy ion elastic and inelastic energy losses. The temperature on the surface in the area around krypton ion trajectory is much higher than the melting and evaporation temperatures for gold as follows from calculations with the various expressions and models.

  3. Methods and apparatus for using gas and liquid phase cathodic depolarizers

    Science.gov (United States)

    Murphy, Oliver J. (Inventor); Hitchens, G. Duncan (Inventor)

    1998-01-01

    The invention provides methods for using gas and liquid phase cathodic depolarizers in an electrochemical cell having a cation exchange membrane in intimate contact with the anode and cathode. The electrochemical conversion of cathodic depolarizers at the cathode lowers the cell potential necessary to achieve a desired electrochemical conversion, such as ozone evolution, at the anode. When gaseous cathodic depolarizers, such as oxygen, are used, a gas diffusion cathode having the cation exchange membrane bonded thereto is preferred. When liquid phase cathodic depolarizers are used, the cathode may be a flow-by electrode, flow-through electrode, packed-bed electrode or a fluidized-bed electrode in intimate contact with the cation exchange membrane.

  4. Nano-Particle Scandate Cathode for Space Communications Phase 2, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose an improved cathode based on our novel theory of the role of scandium oxide in enhancing emission in tungsten-impregnated cathodes. Recent results have...

  5. Cathode for Electric Space Propulsion Utilizing Iodine as Propellant, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose a hollow reservoir cathode suitable for use in ion or Hall thrusters which utilizes iodine as a propellant. Reservoir cathodes have several unique...

  6. Power generation using an activated carbon and metal mesh cathode in a microbial fuel cell

    KAUST Repository

    Zhang, Fang

    2009-11-01

    An inexpensive activated carbon (AC) air cathode was developed as an alternative to a platinum-catalyzed electrode for oxygen reduction in a microbial fuel cell (MFC). AC was cold-pressed with a polytetrafluoroethylene (PTFE) binder to form the cathode around a Ni mesh current collector. This cathode construction avoided the need for carbon cloth or a metal catalyst, and produced a cathode with high activity for oxygen reduction at typical MFC current densities. Tests with the AC cathode produced a maximum power density of 1220 mW/m2 (normalized to cathode projected surface area; 36 W/m3 based on liquid volume) compared to 1060 mW/m2 obtained by Pt catalyzed carbon cloth cathode. The Coulombic efficiency ranged from 15% to 55%. These findings show that AC is a cost-effective material for achieving useful rates of oxygen reduction in air cathode MFCs. © 2009 Elsevier B.V. All rights reserved.

  7. Compact High Current Rare-Earth Emitter Hollow Cathode for Hall Effect Thrusters

    Science.gov (United States)

    Hofer, Richard R. (Inventor); Goebel, Dan M. (Inventor); Watkins, Ronnie M. (Inventor)

    2012-01-01

    An apparatus and method for achieving an efficient central cathode in a Hall effect thruster is disclosed. A hollow insert disposed inside the end of a hollow conductive cathode comprises a rare-earth element and energized to emit electrons from an inner surface. The cathode employs an end opening having an area at least as large as the internal cross sectional area of the rare earth insert to enhance throughput from the cathode end. In addition, the cathode employs a high aspect ratio geometry based on the cathode length to width which mitigates heat transfer from the end. A gas flow through the cathode and insert may be impinged by the emitted electrons to yield a plasma. One or more optional auxiliary gas feeds may also be employed between the cathode and keeper wall and external to the keeper near the outlet.

  8. Theory, Investigation and Stability of Cathode Electrocatalytic Activity

    Energy Technology Data Exchange (ETDEWEB)

    Ding, Dong; Liu, Mingfei; Lai, Samson; Blinn, Kevin; Liu, Meilin

    2012-09-30

    The main objective of this project is to systematically characterize the surface composition, morphology, and electro-catalytic properties of catalysts coated on LSCF, aiming to establish the scientific basis for rational design of high-performance cathodes by combining a porous backbone (such as LSCF) with a thin catalyst coating. The understanding gained will help us to optimize the composition and morphology of the catalyst layer and microstructure of the LSCF backbone for better performance. More specifically, the technical objectives include: (1) to characterize the surface composition, morphology, and electro-catalytic properties of catalysts coated on LSCF; (2) to characterize the microscopic details and stability of the LSCF-catalyst (e.g., LSM) interfaces; (3) to establish the scientific basis for rational design of high-performance cathodes by combining a porous backbone (such as LSCF) with a thin catalyst coating; and (4) to demonstrate that the performance and stability of porous LSCF cathodes can be enhanced by the application of a thin-film coating of LSM through a solution infiltration process in small homemade button cells and in commercially available cells of larger dimension. We have successfully developed dense, conformal LSM films with desired structure, composition, morphology, and thickness on the LSCF surfaces by two different infiltration processes: a non-aqueous and a water-based sol-gel process. It is demonstrated that the activity and stability of LSCF cathodes can be improved by the introduction of a thin-film LSM coating through an infiltration process. Surface and interface of the LSM-coated LSCF cathode were systematically characterized using advanced microscopy and spectroscopy techniques. TEM observation suggests that a layer of La and Sr oxide was formed on LSCF surfaces after annealing. With LSM infiltration, in contrast, we no longer observe such La/Sr oxide layer on the LSM-coated LSCF samples after annealing under similar

  9. Testing a GaAs cathode in SRF gun

    International Nuclear Information System (INIS)

    Wang, E.; Kewisch, J.; Ben-Zvi, I.; Burrill, A.; Rao, T.; Wu, Q.; Holmes, D.

    2011-01-01

    RF electron guns with a strained superlattice GaAs cathode are expected to generate polarized electron beams of higher brightness and lower emittance than do DC guns, due to their higher field gradient at the cathode's surface and lower cathode temperature. We plan to install a bulk GaAs:Cs in a SRF gun to evaluate the performance of both the gun and the cathode in this environment. The status of this project is: In our 1.3 GHz 1/2 cell SRF gun, the vacuum can be maintained at nearly 10 -12 Torr because of cryo-pumping at 2K. With conventional activation of bulk GaAs, we obtained a QE of 10% at 532 nm, with lifetime of more than 3 days in the preparation chamber and have shown that it can survive in transport from the preparation chamber to the gun. The beam line has been assembled and we are exploring the best conditions for baking the cathode under vacuum. We report here the progress of our test of the GaAs cathode in the SRF gun. Future particle accelerators, such as eRHIC and the ILC require high-brightness, high-current polarized electrons. Strained superlattice GaAs:Cs has been shown to be an efficient cathode for producing polarized electrons. Activation of GaAs with Cs,O(F) lowers the electron affinity and makes it energetically possible for all the electrons, excited into the conduction band that drift or diffuse to the emission surface, to escape into the vacuum. Presently, all operating polarized electron sources, such as the CEBAF, are DC guns. In these devices, the excellent ultra-high vacuum extends the lifetime of the cathode. However, the low field gradient on the photocathode's emission surface of the DC guns limits the beam quality. The higher accelerating gradients, possible in the RF guns, generate a far better beam. Until recently, most RF guns operated at room temperature, limiting the vacuum to ∼10 -9 Torr. This destroys the GaAs's NEA surface. The SRF guns combine the excellent vacuum conditions of DC guns and the high accelerating

  10. Nano-structured textiles as high-performance aqueous cathodes for microbial fuel cells

    KAUST Repository

    Xie, Xing

    2011-01-01

    A carbon nanotube (CNT)-textile-Pt cathode for aqueous-cathode microbial fuel cells (MFCs) was prepared by electrochemically depositing Pt nanoparticles on a CNT-textile. An MFC equipped with a CNT-textile-Pt cathode revealed a 2.14-fold maximum power density with only 19.3% Pt loading, compared to that with a commercial Pt coated carbon cloth cathode. © 2011 The Royal Society of Chemistry.

  11. Cathode fall parameters of a self-sustained normal glow discharge in atmospheric-pressure helium

    International Nuclear Information System (INIS)

    Arkhipenko, V.I.; Zgirovskii, S.M.; Kirillov, A.A.; Simonchik, L.V.

    2002-01-01

    Results from comprehensive studies of a high-current self-sustained glow discharge in atmospheric-pressure helium are presented. The main parameters of the cathode fall, namely, the electric field profile, cathode fall thickness, current density, gas temperature, and heat flux to the cathode are determined. The results obtained are discussed using one-dimensional models of the cathode fall with allowance for volumetric heat release

  12. Enhanced microbial electrosynthesis with three-dimensional graphene functionalized cathodes fabricated via solvothermal synthesis

    DEFF Research Database (Denmark)

    Aryal, Nabin; Halder, Arnab; Tremblay, Pier-Luc

    2016-01-01

    The biological reduction of CO2 into multicarbon chemicals can be driven by electrons derived from the cathode of a bioelectrochemical reactor via microbial electrosynthesis (MES). To increase MES productivity, conditions for optimal electron transfer between the cathode and the microbial catalys...... analysis, 3D-graphene/carbon felt composite cathode exhibited higher current response. The results indicate that the development of a 3D-network cathode is an effective approach to improve microbe-electrode interactions leading to productive MES systems....

  13. Reactivity between carbon cathode materials and electrolyte based on industrial and laboratory data

    CSIR Research Space (South Africa)

    Chauke, L

    2013-07-01

    Full Text Available . Wear of the examined carbon cathodes proceeded due to penetration of electrolyte and sodium into the cathode, followed by reactions with carbon and N(sub2) whereby AlN and NaCN formed. Once electrolysis started the carbon cathodes expanded rapidly...

  14. Characterization and optimization of cathodic conditions for H2O2 synthesis in microbial electrochemical cells

    Science.gov (United States)

    Cathode potential and O2 supply methods were investigated to improve H2O2 synthesis in an electrochemical cell, and optimal cathode conditions were applied for microbial electrochemical cells (MECs). Using aqueous O2 for the cathode significantly improved current density, but H2...

  15. Optimized structure stability and electrochemical performance of LiNi0.8Co0.15Al0.05O2 by sputtering nanoscale ZnO film

    Science.gov (United States)

    Lai, Yan-Qing; Xu, Ming; Zhang, Zhi-An; Gao, Chun-Hui; Wang, Peng; Yu, Zi-Yang

    2016-03-01

    LiNi0.8Co0.15Al0.05O2 (NCA) is one of the most promising cathode material for lithium-ion batteries (LIBs) in electric vehicles, which is successfully adopted in Tesla. However, the dissolution of the cation into the electrolyte is still a one of the major challenges (fading capacity and poor cyclability, etc.) presented in pristine NCA. Herein, a homogeneous nanoscale ZnO film is directly sputtered on the surface of NCA electrode via the magnetron sputtering (MS). This ZnO film is evidenced by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The results clearly demonstrate that ZnO film is fully and uniformly covered on the NCA electrodes. After 90 cycles at 1.0C, the optimized MS-2min coated NCA electrode delivers much higher discharge capacity with 169 mAh g-1 than that of the pristine NCA electrode with 127 mAh g-1. In addition, the discharge capacity also reaches 166 mAh g-1 at 3.0C, as compared to that of 125 mAh g-1 for the pristine electrode. The improved electrochemical performance can be ascribed to the superiority of the MS ZnO film that reduce charge transfer resistance and protect the NCA electrode from cation dissolution.

  16. Operational test report - Project W-320 cathodic protection systems

    International Nuclear Information System (INIS)

    Bowman, T.J.

    1998-01-01

    Washington Administrative Code (WAC) 173-303-640 specifies that corrosion protection must be designed into tank systems that treat or store dangerous wastes. Project W-320, Waste Retrieval Sluicing System (WRSS), utilizes underground encased waste transfer piping between tanks 241-C-106 and 241-AY-102. Corrosion protection is afforded to the encasements of the WRSS waste transfer piping through the application of earthen ionic currents onto the surface of the piping encasements. Cathodic protection is used in conjunction with the protective coatings that are applied upon the WRSS encasement piping. WRSS installed two new two rectifier systems (46 and 47) and modified one rectifier system (31). WAC 173-303-640 specifies that the proper operation of cathodic protection systems must be confirmed within six months after initial installation. The WRSS cathodic protection systems were energized to begin continuous operation on 5/5/98. Sixteen days after the initial steady-state start-up of the WRSS rectifier systems, the operational testing was accomplished with procedure OTP-320-006 Rev/Mod A-0. This operational test report documents the OTP-320-006 results and documents the results of configuration testing of integrated piping and rectifier systems associated with the W-320 cathodic protection systems

  17. The fractal nature of vacuum arc cathode spots

    International Nuclear Information System (INIS)

    Anders, Andre

    2005-01-01

    Cathode spot phenomena show many features of fractals, for example self-similar patterns in the emitted light and arc erosion traces. Although there have been hints on the fractal nature of cathode spots in the literature, the fractal approach to spot interpretation is underutilized. In this work, a brief review of spot properties is given, touching the differences between spot type 1 (on cathodes surfaces with dielectric layers) and spot type 2 (on metallic, clean surfaces) as well as the known spot fragment or cell structure. The basic properties of self-similarity, power laws, random colored noise, and fractals are introduced. Several points of evidence for the fractal nature of spots are provided. Specifically power laws are identified as signature of fractal properties, such as spectral power of noisy arc parameters (ion current, arc voltage, etc) obtained by fast Fourier transform. It is shown that fractal properties can be observed down to the cutoff by measurement resolution or occurrence of elementary steps in physical processes. Random walk models of cathode spot motion are well established: they go asymptotically to Brownian motion for infinitesimal step width. The power spectrum of the arc voltage noise falls as 1/f 2 , where f is frequency, supporting a fractal spot model associated with Brownian motion

  18. Early stage beneficial effects of cathodic protection in concrete structures

    NARCIS (Netherlands)

    Polder, R.B.; Peelen, W.H.A.; Neeft, E.A.C.; Stoop, B.T.J.

    2010-01-01

    Over the last 25 years, cathodic protection (CP) of reinforced concrete structures suffering from chloride induced reinforcement corrosion has shown to be successful and durable. CP current causes steel polarisation, electrochemical reactions and ion transport in the concrete. CP systems are

  19. Rigid indented cylindrical cathode for X-ray tube

    Science.gov (United States)

    Hudgens, Claude R.

    1985-01-01

    A cathode assembly for a vacuum tube includes a wire filament, a straight bular anode parallel to and surrounding the wire filament, and insulating spacers for rigidly fastening the filament with respect to the anode, and with one side of the anode indented or flattened such that only one portion of the anode is heated to emitting temperatures by the filament.

  20. Development of Hollow Cathode of High Power Middle Pressure Arcjet.

    Science.gov (United States)

    1995-01-01

    This report results from a contract tasking Moscow Aviation Institute as follows: Determine integral performances of arcjet devices in nitrogen...ammonia, and their mixtures using hollow cathode devices at low and high current levels, perform short term tests (up to 50 hours) for operational reliability and determination of capabilities.