WorldWideScience

Sample records for brightness plasma sputter

  1. Plasma debris sputter resistant x-ray mirror.

    Science.gov (United States)

    Amano, Sho; Inoue, Tomoaki; Harada, Tetsuo

    2013-06-01

    A diamond-like carbon (DLC) mirror, used as a grazing incident mirror in a plasma x-ray source, exhibits a high resistance to plasma debris sputtering. Good mirror reflectivity at a wavelength of 13.5 nm was confirmed using synchrotron radiation at the NewSUBARU facility. The erosion rate due to plasma debris sputtered at the incident debris angle of 20° was measured using a laser-produced Xe plasma source developed by the authors. The results indicate that the DLC film has a 5- and 15-fold higher sputtering resistance compared to films made of the traditional mirror materials Ru and Au, respectively. Because the DLC mirror retains a high sputtering resistance to Sn ions, it may be effective in Sn plasma source applications. We conclude that a grazing incident x-ray mirror coated with DLC can be of use as a plasma debris sputtering resistant mirror.

  2. Plasma properties of RF magnetron sputtering system using Zn target

    Energy Technology Data Exchange (ETDEWEB)

    Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

    2012-06-29

    In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

  3. Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

    DEFF Research Database (Denmark)

    Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

    2016-01-01

    Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

  4. Development of New Sputter System by Magnetic Null Plasma

    OpenAIRE

    敦田, 悟; 楊, 鍾煥; 川尻, 晋平; 成, 烈[ブン; 本田, 親久; 大坪, 昌久

    2004-01-01

    Abstract ###A new type of plasma system based on the magnetic neutral loop discharge (NLD) concept ###has been developed for sputter application. This system is characterized by plasma production ###around the multi null magnetic field on the electrode surface, where a capacitive RF electric ###field is applied. From the experimental results and numerical analysis of electron behavior in ###this system, we found that electrons around the magnetic null region on the target surface ###moved in ...

  5. IR emission from the target during plasma magnetron sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cormier, P.-A. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Thomann, A.-L., E-mail: anne-lise.thomann@univ-orleans.fr [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Dolique, V. [LMA, Université Claude Bernard Lyon I 7 Avenue Pierre de Coubertin, 69622 Villeurbanne Cedex (France); Balhamri, A. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Université Hassan 1, École Supérieure de Technologie, 218 Berrechid (Morocco); Dussart, R.; Semmar, N.; Lecas, T.; Brault, P. [GREMI, Université d' Orléans, 14 rue d' Issoudun, B.P. 6744, 45067 Orleans Cedex2 (France); Snyders, R. [ChIPS, Université de Mons, 20 Place du Parc, 7000 Mons (Belgium); Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium); Konstantinidis, S. [Materia Nova R and D Center, Avenue Corpernic 1, Mons (Belgium)

    2013-10-31

    In this article, energy flux measurements at the substrate location are reported. In particular, the energy flux related to IR radiation emanating from the titanium (10 cm in diam.) target surface is quantified during magnetron sputter deposition processes. In order to modulate the plasma–target surface interaction and the radiative energy flux thereof, the working conditions were varied systematically. The experiments were performed in balanced and unbalanced magnetic field configurations with direct current (DC), pulsed DC and high power impulse magnetron sputtering (HiPIMS) discharges. The power delivered to the plasma was varied too, typically from 100 to 800 W. Our data show that the IR contribution to the total energy flux at the substrate increases with the supplied sputter power and as the discharge is driven in a pulse regime. In the case of HiPIMS discharge generated with a balanced magnetic field, the energy flux associated to the IR radiation produced by the target becomes comparable to the energy flux originating from collisional processes (interaction of plasma particles such as ions, electron, sputtered atoms etc. with the substrate). From IR contribution, it was possible to estimate the rise of the target surface temperature during the sputtering process. Typical values found for a titanium target are in the range 210 °C to 870 °C. - Highlights: • During magnetron sputtering process the heated target emits IR radiation. • We follow in real time the energy transferred to the deposited film by IR radiation. • IR radiation can be the main energy contribution in balanced pulsed processes. • IR radiation might affect the deposition process and the final film properties.

  6. Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

    CERN Document Server

    Martines, E; Cavazzana, R; Adámek, J; Antoni, V; Serianni, G; Spolaore, M; Vianello, N

    2014-01-01

    A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

  7. Arc generation from sputtering plasma-dielectric inclusion interactions

    CERN Document Server

    Wickersham, C E J; Fan, J S

    2002-01-01

    Arcing during sputter deposition and etching is a significant cause of particle defect generation during device fabrication. In this article we report on the effect of aluminum oxide inclusion size, shape, and orientation on the propensity for arcing during sputtering of aluminum targets. The size, shape, and orientation of a dielectric inclusion plays a major role in determining the propensity for arcing and macroparticle emission. In previous studies we found that there is a critical inclusion size required for arcing to occur. In this article we used high-speed videos, electric arc detection, and measurements of particle defect density on wafers to study the effect of Al sub 2 O sub 3 inclusion size, shape, and orientation on arc rate, intensity, and silicon wafer particle defect density. We found that the cross-sectional area of the inclusion exposed to the sputtering plasma is the critical parameter that determines the arc rate and rate of macroparticle emission. Analysis of the arc rate, particle defect...

  8. Method and apparatus for sputtering with a plasma lens

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2016-09-27

    A plasma lens for enhancing the quality and rate of sputter deposition onto a substrate is described herein. The plasma lens serves to focus positively charged ions onto the substrate while deflecting negatively charged ions, while at the same time due to the line of sight positioning of the lens, allowing for free passage of neutrals from the target to the substrate. The lens itself is formed of a wound coil of multiple turns, inside of which are deposed spaced lens electrodes which are electrically paired to impress an E field overtop the B field generated by the coil, the potential applied to the electrodes increasing from end to end towards the center of the lens, where the applied voltage is set to a high potential at the center electrodes as to produce a potential minimum on the axis of the lens.

  9. Plasma-ion Induced Sputtering and Heating of Titan's Atmosphere

    Science.gov (United States)

    Johnson, R. E.; Tucker, O. J.

    2007-05-01

    Titan is unique among the outer solar system icy satellites in having an atmosphere with a column density about ten times that of the Earth's atmosphere and an atmospheric mass to solid mass ratio comparable to that of Venus. Atmospheres equivalent in size to that at Titan would have been removed from the icy Galilean satellites by the plasma trapped in the Jovian magnetosphere (Johnson 2004). Therefore, the use of Cassini data to determine the present erosion rate of Titan's atmosphere provides an important end point for studying the erosion and heating of planetary and satellite atmospheres by an ambient plasma. In this paper we describe the deposition of energy, the erosion and the expansion of the upper atmosphere of Titan using Direct Simulation Monte Carlo models (Shematovich et al. 2003; Michael et al. 2005; Michael and Johnson 2005). These calculations are used to calibrate semi-empirical models of atmospheric sputtering (Johnson 1994) that are used to interpret Cassini data at Titan. Using a number of plasma conditions, the temperature and density vs. altitude above the exobase and the rate of escape are calculated. References: Johnson, R.E. "Plasma-induced Sputtering of an Atmosphere" in Space Science Reviews 69 215-253 (1994). Johnson. R.E., " The magnetospheric plasmadriven evolution of satellite atmospheres" Astrophys. J. 609, L99-L102 (2004). Michael, M. and R.E. Johnson, "Energy deposition of pickup ions and heating of Titan's atmosphere", Planetary & Space Sci.53, 1510-1514 (2005). Michael M., R.E. Johnson, F. Leblanc, M. Liu, J.G. Luhmann, and V.I. Shematovich, "Ejection of nitrogen from Titan's atmosphere by magnetospheric ions and pick-up ions", Icarus 175, 263-267 (2005). Shematovich, V.I., R.E. Johnson, M. Michael, and J.G. Luhmann, "Nitrogen loss from Titan", JGR 108, No. E8, 5087, doi:10.1029/2003JE002094 (2003).

  10. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-09-01

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  11. Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

    Energy Technology Data Exchange (ETDEWEB)

    Chan, K.-Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)], E-mail: k.y.chan@fz-juelich.de; Luo, P.-Q.; Zhou, Z.-B. [Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, 200240 Shanghai (China); Tou, T.-Y.; Teo, B.-S. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2009-03-01

    Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.

  12. Reduction in plasma potential by applying negative DC cathode bias in RF magnetron sputtering

    Science.gov (United States)

    Isomura, Masao; Yamada, Toshinori; Osuga, Kosuke; Shindo, Haruo

    2016-11-01

    We applied a negative DC bias voltage to the cathode of an RF magnetron sputtering system and successfully reduced the plasma potential in both argon plasma and hydrogen-diluted argon plasma. The crystallinity of the deposited Ge films is improved by increasing the negative DC bias voltage. It is indicated that the reduction in plasma potential is effective for reducing the plasma damage on deposited materials, caused by the electric potential between the plasma and substrates. In addition, the deposition rate is increased by the increased electric potential between the plasma and the cathode owing to the negative DC bias voltage. The present method successfully gives us higher speed and lower damage sputtering deposition. The increased electric potential between the plasma and the cathode suppresses the evacuation of electrons from the plasma and also enhances the generation of secondary electrons on the cathode. These probably suppress the electron loss from the plasma and result in the reduction in plasma potential.

  13. Production of fullerene ions by combining of plasma sputtering with laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, K., E-mail: yamada.keisuke@jaea.go.jp; Saitoh, Y.; Yokota, W. [Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan)

    2014-02-15

    We have produced C{sub 60} ion beams by combining plasma sputtering and laser ablation. A C{sub 60} sample was placed in an electron cyclotron resonance type ion source, negatively biased and sputtered by argon plasma. The beam current of C{sub 60}{sup +} decreased rapidly, but it was transiently recovered by a single laser shot that ablates the thin sample surface on the sputtered area. Temporal variations in beam current are reported in response to laser shots repeated at intervals of a few minutes.

  14. Focused ion beams using a high-brightness plasma source

    Science.gov (United States)

    Guharay, Samar

    2002-10-01

    High-brightness ion beams, with low energy spread, have merits for many new applications in microelectronics, materials science, and biology. Negative ions are especially attractive for the applications that involve beam-solid interactions. When negative ions strike a surface, especially an electrically isolated surface, the surface charging voltage is limited to few volts [1]. This property can be effectively utilized to circumvent problems due to surface charging, such as device damage and beam defocusing. A compact plasma source, with the capability to deliver either positive or negative ion beams, has been developed. H- beams from this pulsed source showed brightness within an order of magnitude of the value for beams from liquid-metal ion sources. The beam angular intensity is > 40 mAsr-1 and the corresponding energy spread is 1 Acm-2 and a spot size of 100 nm. Such characteristics of focused beam parameters, using a dc source, will immediately open up a large area of new applications. [1] P. N. Guzdar, A. S. Sharma, S. K. Guharay, "Charging of substrates irradiated by particle beams" Appl. Phys. Lett. 71, 3302 (1997). [2] S. K. Guharay, E. Sokolovsky, J. Orloff, "Characteristics of ion beams from a Penning source for focused ion beam applications" J. Vac. Sci Technol. B17, 2779 (1999).

  15. Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities

    NARCIS (Netherlands)

    Bystrov, K.; Morgan, T. W.; Tanyeli, I.; De Temmerman, G.; M. C. M. van de Sanden,

    2013-01-01

    We report measurements of chemical sputtering yields of graphite exposed to low temperature nitrogen plasmas. The influence of surface temperature and incoming ion energy on the sputtering yields has been investigated in two distinct ion flux density regimes. Sputtering yields grow consistently with

  16. Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment

    Science.gov (United States)

    M. Borghei, S.; Shahidi, S.; Ghoranneviss, M.; Abdolahi, Z.

    2013-01-01

    In this research the effects of mordant and plasma sputtering treatments on the crystallinity and morphological properties of wool fabrics were investigated. The felting behavior of the treated samples was also studied. We used madder as a natural dye and copper sulfate as a metal mordant. We also used copper as the electrode material in a DC magnetron plasma sputtering device. The anti-felting properties of the wool samples before and after dying was studied, and it was shown that the shrink resistance and anti-felting behavior of the wool had been significantly improved by the plasma sputtering treatment. In addition, the percentage of crystallinity and the size of the crystals were investigated using an X-ray diffractometer, and a scanning electron microscope was used for morphological analysis. The amount of copper particles on the surface of the mordanted and sputtered fabrics was studied using the energy dispersive X-ray (EDX) method, and the hydrophobic properties of the samples were examined using the water drop test. The results show that with plasma sputtering treatment, the hydrophobic properties of the surface of wool become super hydrophobic.

  17. Nanostructure growth by helium plasma irradiation to tungsten in sputtering regime

    Energy Technology Data Exchange (ETDEWEB)

    Noiri, Y., E-mail: noiri-yasuyuki13@ees.nagoya-u.ac.jp [Graduate School of Engineering, Nagoya University, Nagoya 464-8603 (Japan); Kajita, S., E-mail: kajita@ees.nagoya-u.ac.jp [EcoTopia Science Institute, Nagoya University, Nagoya 464-8603 (Japan); Ohno, N. [Graduate School of Engineering, Nagoya University, Nagoya 464-8603 (Japan)

    2015-08-15

    The formation of nanostructure on tungsten (W) surface due to Helium (He) plasma irradiation can be harmful for fusion reactors. Up to now, W nanostructure growth was investigated mainly without sputtering. Under sputtering regime, nanostructure growth competes with erosion due to sputtering. In this study, the nanostructure growth was investigated in the linear divertor simulator NAGDIS-II at incident ion energy range of 200–500 eV. The growth of nanostructures was investigated by experiments and calculations under the sputtering regime. With increasing incident ion energy, the thickness of nanostructured W layer saturated rapidly at a lower He fluence, resulting in thinner W nanostructured layer. The erosion rate of the top of the W nanostructured layer was obtained from the comparison with the numerical calculation.

  18. Validity of "sputtering and re-condensation" model in active screen cage plasma nitriding process

    Science.gov (United States)

    Saeed, A.; Khan, A. W.; Jan, F.; Abrar, M.; Khalid, M.; Zakaullah, M.

    2013-05-01

    The validity of "sputtering and re-condensation" model in active screen plasma nitriding for nitrogen mass transfer mechanism is investigated. The dominant species including NH, Fe-I, N2+, N-I and N2 along with Hα and Hβ lines are observed in the optical emission spectroscopy (OES) analysis. Active screen cage and dc plasma nitriding of AISI 316 stainless steel as function of treatment time is also investigated. The structure and phases composition of the nitrided layer is studied by X-ray diffraction (XRD). Surface morphology is studied by scanning electron microscopy (SEM) and hardness profile is obtained by Vicker's microhardness tester. Increasing trend in microhardness is observed in both cases but the increase in active screen plasma nitriding is about 3 times greater than that achieved by dc plasma nitriding. On the basis of metallurgical and OES observations the use of "sputtering and re-condensation" model in active screen plasma nitriding is tested.

  19. Thin Film Formation of Gallium Nitride Using Plasma-Sputter Deposition Technique

    Directory of Open Access Journals (Sweden)

    R. Flauta

    2003-06-01

    Full Text Available The formation of gallium nitride (GaN thin film using plasma-sputter deposition technique has beenconfirmed. The GaN film deposited on a glass substrate at an optimum plasma condition has shown x-raydiffraction (XRD peaks at angles corresponding to that of (002 and (101 reflections of GaN. The remainingmaterial on the sputtering target exhibited XRD reflections corresponding to that of bulk GaN powder. Toimprove the system’s base pressure, a new UHV compatible system is being developed to minimize theimpurities in residual gases during deposition. The sputtering target configuration was altered to allow themonitoring of target temperature using a molybdenum (Mo holder, which is more stable against Gaamalgam formation than stainless steel.

  20. Plasma properties during magnetron sputtering of lithium phosphorous oxynitride thin films

    DEFF Research Database (Denmark)

    Christiansen, Ane Sælland; Stamate, Eugen; Thydén, Karl Tor Sune

    2015-01-01

    properties and microstructure of the films. Low pressure and moderate power are associated with lower plasma density, higher electron temperature, higher plasma potential and larger diffusion length for sputtered particles. This combination of parameters favors the presence of more atomic nitrogen, a fact...... that correlates with a higher ionic conductivity. Despite of lower plasma density the film grows faster at lower pressure where the higher plasma potential, translated into higher energy for impinging ions on the substrate, resulted in a compact and smooth film structure. Higher pressures showed much less...

  1. Structuring of DLC:Ag nanocomposite thin films employing plasma chemical etching and ion sputtering

    Science.gov (United States)

    Tamulevičius, Tomas; Tamulevičienė, Asta; Virganavičius, Dainius; Vasiliauskas, Andrius; Kopustinskas, Vitoldas; Meškinis, Šarūnas; Tamulevičius, Sigitas

    2014-12-01

    We analyze structuring effects of diamond like carbon based silver nanocomposite (DLC:Ag) thin films by CF4/O2 plasma chemical etching and Ar+ sputtering. DLC:Ag films were deposited employing unbalanced reactive magnetron sputtering of silver target with Ar+ in C2H2 gas atmosphere. Films with different silver content (0.6-12.9 at.%) were analyzed. The films (as deposited and exposed to plasma chemical etching) were characterized employing scanning electron microscopy and energy dispersive X-ray analysis (SEM/EDS), optical microscopy, ultraviolet-visible light (UV-VIS) spectroscopy and Fourier transform infrared (FTIR) spectroscopy. After deposition, the films were plasma chemically etched in CF4/O2 mixture plasma for 2-6 min. It is shown that optical properties of thin films and silver nano particle size distribution can be tailored during deposition changing the magnetron current and C2H2/Ar ratio or during following plasma chemical etching. The plasma etching enabled to reveal the silver filler particle size distribution and to control silver content on the surface that was found to be dependent on Ostwald ripening process of silver nano-clusters. Employing contact lithography and 4 μm period mask in photoresist or aluminum the films were patterned employing CF4/O2 mixture plasma chemical etching, direct Ar+ sputtering or combined etching processes. It is shown that different processing recipes result in different final grating structures. Selective carbon etching in CF4/O2 gas mixture with photoresist mask revealed micrometer range lines of silver nanoparticles, while Ar+ sputtering and combined processing employing aluminum mask resulted in nanocomposite material (DLC:Ag) micropatterns.

  2. Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ehiasarian, Arutiun P; Andersson, Joakim; Anders, Andr& #233

    2010-04-18

    The plasma composition of high power impulse magnetron sputtering (HIPIMS) has been studied for titanium and chromium targets using a combined energy analyser and quadrupole mass spectrometer. Measurements were done at distances from 50 to 300 mm from the sputtering target. Ti and Cr are similar in atomic mass but have significantly different sputter yields, which gives interesting clues on the effect of the target on plasma generation and transport of atoms. The Ti and Cr HIPIMS plasmas operated at a peak target current density of ~;;0.5 A cm-2. The measurements of the argon and metal ion content as well as the ion energy distribution functions showed that (1) singly and doubly charged ions were found for argon as well as for the target metal, (2) the majority of ions were singly charged argon for both metals at all distances investigated, (3) the Cr ion density was maintained to distances further from the target than Ti. Gas rarefaction was identified as a main factor promoting transport of metal ions, with the stronger effect observed for Cr, the material with higher sputter yield. Cr ions were found to displace a significant portion of the gas ions, whereas this was less evident in the Ti case. The observations indicate that the presence of metal vapour promotes charge exchange and reduces the electron temperature and thereby practically prevents the production of Ar2+ ions near the target. The content of higher charge states of metal ions depends on the probability of charge exchange with argon.

  3. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

    Energy Technology Data Exchange (ETDEWEB)

    Macak, Karol [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Kouznetsov, Vladimir [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Schneider, Jochen [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Helmersson, Ulf [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Petrov, Ivan [Materials Science Department and Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)

    2000-07-01

    Time resolved plasma probe measurements of a novel high power density pulsed plasma discharge are presented. Extreme peak power densities in the pulse (on the order of several kW cm{sup -2}) result in a very dense plasma with substrate ionic flux densities of up to 1 A cm{sup -2} at source-to-substrate distances of several cm and at a pressure of 0.13 Pa (1 mTorr). The pulse duration was {approx}100 {mu}s with a pulse repetition frequency of 50 Hz. The plasma consists of metallic and inert gas ions, as determined from time resolved Langmuir probe measurements and in situ optical emission spectroscopy data. It was found that the plasma composition at the beginning of the pulse was dominated by Ar ions. As time elapsed metal ions were detected and finally dominated the ion composition. The effect of the process parameters on the temporal development of the ionic fluxes is discussed. The ionized portion of the sputtered metal flux was found to have an average velocity of 2500 m s{sup -1} at 6 cm distance from the source, which conforms to the collisional cascade sputtering theory. The degree of ionization of the sputtered metal flux at a pressure of 0.13 Pa was found to be 40%{+-}20% by comparing the total flux of deposited atoms with the charge measured for the metal ions in the pulse. (c) 2000 American Vacuum Society.

  4. Properties of AlN films deposited by reactive ion-plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Bert, N. A.; Bondarev, A. D.; Zolotarev, V. V.; Kirilenko, D. A.; Lubyanskiy, Ya. V.; Lyutetskiy, A. V.; Slipchenko, S. O.; Petrunov, A. N.; Pikhtin, N. A., E-mail: nike@hpld.ioffe.ru; Ayusheva, K. R.; Arsentyev, I. N.; Tarasov, I. S. [Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)

    2015-10-15

    The properties of SiO{sub 2}, Al{sub 2}O{sub 3}, and AlN dielectric coatings deposited by reactive ion-plasma sputtering are studied. The refractive indices of the dielectric coatings are determined by optical ellipsometry. It is shown that aluminum nitride is the optimal material for achieving maximum illumination of the output mirror of a semiconductor laser. A crystalline phase with a hexagonal atomic lattice and oxygen content of up to 10 at % is found by transmission electron microscopy in the aluminum-nitride films. It is found that a decrease in the concentration of residual oxygen in the chamber of the reactive ion-plasma sputtering installation makes it possible to eliminate the appearance of vertical pores in the bulk of the aluminum-nitride film.

  5. Experimental investigation of quasiperiodic-chaotic-quasiperiodic-chaotic transition in a direct current magnetron sputtering plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sabavath, Gopi Kishan; Banerjee, I.; Mahapatra, S. K., E-mail: skmahapatra@bitmesra.ac.in [Plasma Laboratory, Department of Physics, Birla Institute of Technology-Mesra, Ranchi 835215 (India); Shaw, Pankaj Kumar; Sekar Iyengar, A. N. [Plasma Physics Division, Saha Institute of Nuclear Physics, 1/AF, Bidhannagar, Kolkata 700064 (India)

    2015-08-15

    Floating potential fluctuations from a direct current magnetron sputtering plasma have been analysed using time series analysis techniques like phase space plots, power spectra, frequency bifurcation plot, etc. The system exhibits quasiperiodic-chaotic-quasiperiodic-chaotic transitions as the discharge voltage was increased. The transitions of the fluctuations, quantified using the largest Lyapunov exponent, have been corroborated by Hurst exponent and the Shannon entropy. The Shannon entropy is high for quasiperiodic and low for chaotic oscillations.

  6. RP and RQA Analysis for Floating Potential Fluctuations in a DC Magnetron Sputtering Plasma

    Science.gov (United States)

    Sabavath, Gopikishan; Banerjee, I.; Mahapatra, S. K.

    2016-04-01

    The nonlinear dynamics of a direct current magnetron sputtering plasma is visualized using recurrence plot (RP) technique. RP comprises the recurrence quantification analysis (RQA) which is an efficient method to observe critical regime transitions in dynamics. Further, RQA provides insight information about the system’s behavior. We observed the floating potential fluctuations of the plasma as a function of discharge voltage by using Langmuir probe. The system exhibits quasi-periodic-chaotic-quasi-periodic-chaotic transitions. These transitions are quantified from determinism, Lmax, and entropy of RQA. Statistical investigations like kurtosis and skewness also studied for these transitions which are in well agreement with RQA results.

  7. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  8. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Yuchen [State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Zhou, Xue [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000 (China); Liu, Jason X. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Physics, University of California, Berkeley, Berkeley, California 94720 (United States); Anders, André, E-mail: aanders@lbl.gov [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

    2016-01-18

    We present evidence for breathing modes in magnetron sputtering plasmas: periodic axial variations of plasma parameters with characteristic frequencies between 10 and 100 kHz. A set of azimuthally distributed probes shows synchronous oscillations of the floating potential. They appear most clearly when considering the intermediate current regime in which the direction of azimuthal spoke motion changes. Breathing oscillations were found to be superimposed on azimuthal spoke motion. Depending on pressure and current, one can also find a regime of chaotic fluctuations and one of stable discharges, the latter at high current. A pressure-current phase diagram for the different situations is proposed.

  9. Effect of Wall Material on H– Production in a Plasma Sputter-Type Ion Source

    Directory of Open Access Journals (Sweden)

    Y. D. M. Ponce

    2004-12-01

    Full Text Available The effect of wall material on negative hydrogen ion (H– production was investigated in a multicusp plasma sputter-type ion source (PSTIS. Steady-state cesium-seeded hydrogen plasma was generated by a tungsten filament, while H– was produced through surface production using a molybdenum sputter target. Plasma parameters and H– yields were determined from Langmuir probe and Faraday cup measurements, respectively. At an input hydrogen pressure of 1.2 mTorr and optimum plasma discharge parameters Vd = –90 V and Id = –2.25 A, the plasma parameters ne was highest and T–e was lowest as determined from Langmuir probe measurements. At these conditions, aluminum generates the highest ion current density of 0.01697 mA/cm2, which is 64% more than the 0.01085 mA/cm2 that stainless steel produces. The yield of copper, meanwhile, falls between the two materials at 0.01164 mA/cm2. The beam is maximum at Vt = –125 V. Focusing is achieved at VL = –70 V for stainless steel, Vt = –60 V for aluminum, and Vt = –50 V for copper. The results demonstrate that proper selection of wall material can greatly enhance the H– production of the PSTIS.

  10. Influence of bias on properties of carbon films deposited by MCECR plasma sputtering method

    Institute of Scientific and Technical Information of China (English)

    CAI Chang-long; DIAO Dong-feng; S.Miyake; T.Matsumoto

    2004-01-01

    The mirror-confinement-type electron cyclotron resonance(MCECR) plasma source has high plasma density and high electron temperature. It is quite useful in many plasma processing, and has been used for etching and thin-film deposition. The carbon films with 40 nm thickness were deposited by MCECR plasma sputtering method on Si, and the influence of substrate bias on the properties of carbon films was studied. The bonding structure of the film was analyzed by the X-ray photoelectron spectroscopy(XPS), the tribological properties were measured by the pin-on-disk(POD) tribometer, the nanohardness of the films was measured by the nanoindenter, and the deposition speed and the refractive index were measured by the ellipse meter. The better substrate bias was obtained, and the better properties of carbon films were obtained.

  11. Composite materials obtained by the ion-plasma sputtering of metal compound coatings on polymer films

    Science.gov (United States)

    Khlebnikov, Nikolai; Polyakov, Evgenii; Borisov, Sergei; Barashev, Nikolai; Biramov, Emir; Maltceva, Anastasia; Vereshchagin, Artem; Khartov, Stas; Voronin, Anton

    2016-01-01

    In this article, the principle and examples composite materials obtained by deposition of metal compound coatings on polymer film substrates by the ion-plasma sputtering method are presented. A synergistic effect is to obtain the materials with structural properties of the polymer substrate and the surface properties of the metal deposited coatings. The technology of sputtering of TiN coatings of various thicknesses on polyethylene terephthalate films is discussed. The obtained composites are characterized by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and scanning tunneling microscopy (STM) is shown. The examples of application of this method, such as receiving nanocomposite track membranes and flexible transparent electrodes, are considered.

  12. Sputter-cleaning of an aluminum alloy using a thermionically assisted triode plasma system

    Energy Technology Data Exchange (ETDEWEB)

    Hsieh, J.H., E-mail: jhhsieh@mail.mcut.edu.tw [Dept. of Materials Engineering, Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan ROC (China); Center for Thin Film Technologies and Applications (CTFTA), Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan, ROC (China); Li, C. [Dept. of Biomedical Engineering, National Yang Ming University, Taipei, Taiwan, ROC (China); Center for Thin Film Technologies and Applications (CTFTA), Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan, ROC (China); Liu, S.J. [Dept. of Math. and Sci., National Taiwan Normal University, Linkou 244, Taiwan, ROC (China)

    2013-09-16

    Polished aluminum alloy (6061) samples were cleaned using Ar plasma in a diode or triode plasma system. By monitoring cathode current, the changes of surface state and removal (cleaning) rate were determined and compared based on various setup. A modified mathematical model, based on Berg's reactive sputtering model, is derived and proposed to simulate the cleaning process. The results show that it is possible to sputter-clean the substrate under a triode setup with low bias and high ion bombardment rate (i.e. −500 V, triode, 1.3 Pa). This triode cleaning process was comparable with high bias and high working pressure diode process (i.e. −2500 V, diode, 3.3 Pa). Cleaning with high energy particle bombardment can create rough surface in nano-scale, although with the similar efficiency. Also, according to the regressive fitting on the cathode current–time curve, it is found that the average secondary electron yield for the oxide compound is around 0.33 if the average secondary electron yield for aluminum metal is 0.1. - Highlights: • Plasma with various ion energies could be generated using a triode system. • A model was built to explain the plasma cleaning process. • The results are believed to be useful in cleaning precision metal parts. • Secondary electron yield could be estimated using the adopted approach. • By using a triode system, the surface roughness could be controlled as will.

  13. Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Peipei; Yang, Xu; Li, Hui; Cai, Hua [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Sun, Jian; Xu, Ning [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Wu, Jiada, E-mail: jdwu@fudan.edu.cn [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433 (China)

    2015-10-15

    A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanying film growth. And, the re-sputtering presents ion-induced sputtering features.

  14. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    OpenAIRE

    Trieschmann, Jan; Schmidt, Frederik; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo me...

  15. Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Centre for Quantum Technologies, National University of Singapore, 3 Science Drive 2, 117543 Singapore, Singapore; Andersson, Joakim; Ni, Pavel; Anders, Andre

    2013-07-17

    Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

  16. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    CERN Document Server

    Trieschmann, Jan; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo methods as well as the conceptual details in the context of the sputtering scenario are elaborated on. Finally, two in the context of sputtering transport simulations often exploited assumptions, namely on the energy distribution of impinging ions as well as on the test particle approach, are validated for the proposed example discharge.

  17. Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources

    Energy Technology Data Exchange (ETDEWEB)

    Wu Tao [Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Rao Zhiming [Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine, Nanchang 330004, Jiangxi (China); Wang Shifang, E-mail: flatime@163.com [School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East High-Tech. Zone, Wuhan 430205, Hubei (China)

    2011-02-01

    Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.

  18. Feasibility of arc-discharge and plasma-sputtering methods in cleaning plasma-facing and diagnostics components of fusion reactors

    Energy Technology Data Exchange (ETDEWEB)

    Hakola, Antti, E-mail: antti.hakola@vtt.fi [VTT Technical Research Centre of Finland, VTT (Finland); Likonen, Jari [VTT Technical Research Centre of Finland, VTT (Finland); Karhunen, Juuso; Korhonen, Juuso T. [Department of Applied Physics, Aalto University (Finland); Aints, Märt; Laan, Matti; Paris, Peeter [Department of Physics, University of Tartu (Estonia); Kolehmainen, Jukka; Koskinen, Mika; Tervakangas, Sanna [DIARC-Technology Oy, Espoo (Finland)

    2015-10-15

    Highlights: • Feasibility of the arc-discharge and plasma-sputtering techniques in removing deposited layers from ITER-relevant samples demonstrated. • Samples with the size of an A4 paper can be cleaned from 1-μm thick deposited layers in 10–20 minutes by the arc-discharge method. • The plasma-sputtering method is 5–10 times slower but the resulting surfaces are very smooth. • Arc-discharge method could be used for rapid cleaning of plasma-facing components during maintenance shutdowns of ITER, plasma sputtering is preferred for diagnostics mirrors. - Abstract: We have studied the feasibility of arc-discharge and plasma-sputtering methods in removing deposited layers from ITER-relevant test samples. Prototype devices have been designed and constructed for the experiments and the cleaning process is monitored by a spectral detection system. The present version of the arc-discharge device is capable of removing 1-μm thick layers from 350-mm{sup 2} areas in 4–8 s, but due to the increased roughness of the cleaned surfaces and signs of local melting, mirror-like surfaces cannot be treated by this technique. The plasma-sputtering approach, for its part, is some 5–10 times slower in removing the deposited layers but no changes in surface roughness or morphology of the samples could be observed after the cleaning phase. The arc-discharge technique could therefore be used for rapid cleaning of plasma-facing components during maintenance shutdowns of ITER while in the case of diagnostics mirrors plasma sputtering is preferred.

  19. Bright gamma-rays from betatron resonance acceleration in near critical density plasma

    CERN Document Server

    Liu, B; Wu, D; Liu, J; Chen, C E; Yan, X Q; He, X T

    2013-01-01

    We show that electron betatron resonance acceleration by an ultra-intense ultra-short laser pulse in a near critical density plasma works as a high-brightness gamma-ray source. Compared with laser plasma X-ray sources in under-dense plasma, near critical density plasma provides three benefits for electron radiation: more radiation electrons, larger transverse amplitude, and higher betatron oscillation frequency. Three-dimensional particle-in-cell simulations show that, by using a 7.4J laser pulse, 8.3mJ radiation with critical photon energy 1MeV is emitted. The critical photon energy $E_c$ increases with the incident laser energy %faster than a linear relation. $W_I$ as $E_c \\propto W_I^{1.5}$, and the corresponding photon number is proportional to $W_I$. A simple analytical synchrotron-like radiation model is built, which can explain the simulation results.

  20. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Tverdokhlebov, S.I., E-mail: tverd@tpu.ru [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Bolbasov, E.N.; Shesterikov, E.V. [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Antonova, L.V.; Golovkin, A.S.; Matveeva, V.G. [Federal State Budgetary Institution Research Institute for Complex Issues of Cardiovascular Disease, 6 Sosnovy Blvd, Kemerovo 650002 (Russian Federation); Petlin, D.G.; Anissimov, Y.G. [Griffith University, School of Natural Sciences, Engineering Dr., Southport, QLD 4222 (Australia)

    2015-02-28

    Highlights: • The treatment by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering improves the biocompatibility of PLLA surface. • The treatment significantly increases the roughness of PLLA surface. • The formation of rough highly porous surface is due to the etching and crystallization processes on PLLA surface during treatment. • Maximum concentration of the ions from the sputtered target is achieved at 60 s of the plasma treatment. - Abstract: Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  1. The variation of Io's auroral footprint brightness with the location of Io in the plasma torus

    Science.gov (United States)

    Serio, Andrew W.; Clarke, John T.

    2008-09-01

    Ultraviolet and near-infrared observations of auroral emissions from the footprint of Io's magnetic Flux Tube (IFT) mapping to Jupiter's ionosphere have been interpreted via a combination of the unipolar inductor model [Goldreich, P., Lynden-Bell, D., 1969. Astrophys. J. 156, 59-78] and the multiply-reflected Alfvén wave model [ Belcher, J.W., 1987. Science 238, 170-176]. While both models successfully explain the general nature of the auroral footprint and corotational wake, and both predict the presence of multiple footprints, the details of the interaction near Io are complicated [ Saur, J., Neubauer, F.M., Connerney, J.E.P., Zarka, P., Kivelson, M.G., 2004. In: Bagenal, F., Dowling, T.E., McKinnon, W.B. (Eds.), Jupiter: The Planet, Satellites and Magnetosphere. Cambridge University Press, Cambridge, UK, pp. 537-560; Kivelson, M.G., Bagenal, F., Kurth, W.S., Neubauer, F.M., Paranicas, C., Saur, J., 2004. In: Bagenal, F., Dowling, T.E., McKinnon, W.B. (Eds.), Jupiter: The Planet, Satellites and Magnetosphere. Cambridge University Press, Cambridge, UK, pp. 513-536]. The auroral footprint brightness is believed to be a good remote indicator of the strength of the interaction near Io, indicating the energy and current strength linking Io with Jupiter's ionosphere. The brightness may also depend in part on local auroral acceleration processes near Jupiter. The relative importance of different physical processes in this interaction can be tested as Jupiter's rotation and Io's orbital motion shift Jupiter's magnetic centrifugal equator past Io, leading to longitudinal variations in the plasma density near Io and functionally different variations in the local field strength near Jupiter where the auroral emissions are produced. Initial HST WFPC2 observations found a high degree of variability in the footprint brightness with time, and some evidence for systematic variations with longitude [Clarke, J.T., Ben Jaffel, L., Gérard, J.-C., 1998. J. Geophys. Res. 103, 20217

  2. Comparative study of nanocomposites prepared by pulsed and dc sputtering combined with plasma polymerization suitable for photovoltaic device applications

    Energy Technology Data Exchange (ETDEWEB)

    Hussain, Amreen A. [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Pal, Arup R., E-mail: arpal@iasst.gov.in [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Kar, Rajib [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India); Bailung, Heremba; Chutia, Joyanti [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Patil, Dinkar S. [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India)

    2014-12-15

    Plasma processing, a single step method for production of large area composite films, is employed to deposit plasma polymerized aniline-Titanium dioxide (PPani-TiO{sub 2}) nanocomposite thin films. The deposition of PPani-TiO{sub 2} nanocomposite films are made using reactive magnetron sputtering and plasma polymerization combined process. This study focuses on the direct comparison between continuous and pulsed dc magnetron sputtering techniques of titanium in combination with rf plasma polymerization of aniline. The deposited PPani-TiO{sub 2} nanocomposite films are characterized and discussed in terms of structural, morphological and optical properties. A self powered hybrid photodetector has been developed by plasma based process. The proposed method provides a new route where the self-assembly of molecules, that is, the spontaneous association of atomic or molecular building blocks under plasma environment, emerge as a successful strategy to form well-defined structural and morphological units of nanometer dimensions. - Highlights: • PPani-TiO{sub 2} nanocomposite by pulsed and dc sputtering with rf plasma polymerization. • In-situ and Ex-situ H{sub 2}SO{sub 4} doping in PPani-TiO{sub 2} nanocomposite. • PPani-TiO{sub 2} nanocomposite based self-powered-hybrid photodetector.

  3. Parameter Study of Plasma-Induced Atmospheric Sputtering and Heating at Mars

    Science.gov (United States)

    Williamson, Hayley N.; Johnson, Robert E.; Leblanc, Francois

    2014-11-01

    Atoms and molecules in Mars’ upper atmosphere are lost predominately through sputtering, caused by the impact of ions into the exosphere, dissociative recombination, and thermal escape. While all three processes are thought to occur on Mars, a detailed understanding must ascertain the relative importance of each process, due to time variations in pick-up and solar wind ions. In this project, using case studies of an oxygen atmosphere modeled with Direct Simulation Monte Carlo techniques, we have endeavored to categorize when the momentum transfer or thermal escape is more likely to occur. To do this, we vary the incident plasma flux and energy based on models of the interaction of the solar wind with the Martian atmosphere. We first repeat the heating and sputtering rates due to a flux of pick-up O+ examined previously (Johnson et al. 2000; Michael and Johnson 2005; Johnson et al 2013). We have used multiple examples of particle fluxes for various solar wind conditions, from steady solar wind conditions (Luhmann et al. 1992; Chaufray et al. 2007) to more extreme cases (Fang et al. 2013; Wang et al. 2014), which are thought to increase escape by several orders of magnitude. The goal is to explore the escape parameter space in preparation for the expected data from MAVEN on hot atoms and molecules in the Martian exosphere.

  4. Performance of plasma sputtered fuel cell electrodes with ultra-low Pt loadings

    Energy Technology Data Exchange (ETDEWEB)

    Cavarroc, M.; Ennadjaoui, A. [MID Dreux Innovation, CAdD, 4 Rue Albert Caquot-28500 Vernouillet (France); Mougenot, M.; Brault, P.; Escalier, R.; Tessier, Y. [Groupe de Recherches sur l' Energetique des Milieux Ionises, CNRS Universite d' Orleans, BP6744, 14 rue d' Issoudun, 45067 Orleans (France); Durand, J.; Roualdes, S. [Institut Europeen des Membranes, ENSCM, UM2, CNRS, Universite Montpellier 2, CC047, Place Eugene Bataillon, 34095 Montpellier cedex 5 (France); Sauvage, T. [Conditions Extremes et Materiaux, Haute Temperature et Irradiation, UPR3079 CNRS, Site Cyclotron, 3A rue de la Ferollerie, 45071 Orleans Cedex 2 (France); Coutanceau, C. [Laboratoire de Catalyse en Chimie Organique, UMR6503 Universite de Poitiers, CNRS, 86022, Poitiers (France)

    2009-04-15

    Ultra-low Pt content PEMFC electrodes have been manufactured using magnetron co-sputtering of carbon and platinum on a commercial E-Tek {sup registered} uncatalyzed gas diffusion layer in plasma fuel cell deposition devices. Pt loadings of 0.16 and 0.01 mg cm{sup -2} have been realized. The Pt catalyst is dispersed as small clusters with size less than 2 nm over a depth of 500 nm. PEMFC test with symmetric electrodes loaded with 10 {mu}g cm{sup -2} led to maximum reproducible power densities as high as 0.4 and 0.17 W cm{sup -2} with Nafion {sup registered} 212 and Nafion {sup registered} 115 membranes, respectively. (author)

  5. Plasma potential of a moving ionization zone in DC magnetron sputtering

    Science.gov (United States)

    Panjan, Matjaž; Anders, André

    2017-02-01

    Using movable emissive and floating probes, we determined the plasma and floating potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge. Measurements were recorded in a space and time resolved manner, which allowed us to make a three-dimensional representation of the plasma potential. From this information we could derive the related electric field, space charge, and the related spatial distribution of electron heating. The data reveal the existence of strong electric fields parallel and perpendicular to the target surface. The largest E-fields result from a double layer structure at the leading edge of the ionization zone. We suggest that the double layer plays a crucial role in the energization of electrons since electrons can gain several 10 eV of energy when crossing the double layer. We find sustained coupling between the potential structure, electron heating, and excitation and ionization processes as electrons drift over the magnetron target. The brightest region of an ionization zone is present right after the potential jump, where drifting electrons arrive and where most local electron heating occurs. The ionization zone intensity decays as electrons continue to drift in the Ez × B direction, losing energy by inelastic collisions; electrons become energized again as they cross the potential jump. This results in the elongated, arrowhead-like shape of the ionization zone. The ionization zone moves in the -Ez × B direction from which the to-be-heated electrons arrive and into which the heating region expands; the zone motion is dictated by the force of the local electric field on the ions at the leading edge of the ionization zone. We hypothesize that electron heating caused by the potential jump and physical processes associated with the double layer also apply to magnetrons at higher discharge power, including high power impulse magnetron sputtering.

  6. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Science.gov (United States)

    Tverdokhlebov, S. I.; Bolbasov, E. N.; Shesterikov, E. V.; Antonova, L. V.; Golovkin, A. S.; Matveeva, V. G.; Petlin, D. G.; Anissimov, Y. G.

    2015-02-01

    Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  7. Vehicle Exhaust Gas Clearance by Low Temperature Plasma-Driven Nano-Titanium Dioxide Film Prepared by Radiofrequency Magnetron Sputtering

    OpenAIRE

    Shuang Yu; Yongdong Liang; Shujun Sun; Kai Zhang; Jue Zhang; Jing Fang

    2013-01-01

    A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on t...

  8. Bright X-ray source from a laser-driven micro-plasma-waveguide

    CERN Document Server

    Yi, Longqing

    2016-01-01

    Bright tunable x-ray sources have a number of applications in basic science, medicine and industry. The most powerful sources are synchrotrons, where relativistic electrons are circling in giant storage rings. In parallel, compact laser-plasma x-ray sources are being developed. Owing to the rapid progress in laser technology, very high-contrast femtosecond laser pulses of relativistic intensities become available. These pulses allow for interaction with micro-structured solid-density plasma without destroying the structure by parasitic pre-pulses. The high-contrast laser pulses as well as the manufacturing of materials at micro- and nano-scales open a new realm of possibilities for laser interaction with photonic materials at the relativistic intensities. Here we demonstrate, via numerical simulations, that when coupling with a readily available 1.8 Joule laser, a micro-plasma-waveguide (MPW) may serve as a novel compact x-ray source. Electrons are extracted from the walls by the laser field and form a dense ...

  9. Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source

    Science.gov (United States)

    Vinokhodov, A.; Krivokorytov, M.; Sidelnikov, Yu.; Krivtsun, V.; Medvedev, V.; Bushuev, V.; Koshelev, K.; Glushkov, D.; Ellwi, S.

    2016-10-01

    We present the results of the low-melting liquid metal droplets generation based on excited Rayleigh jet breakup. We discuss on the operation of the industrial and in-house designed and manufactured dispensing devices for the droplets generation. Droplet diameter can be varied in the range of 30-90 μm. The working frequency of the droplets, velocity, and the operating temperature were in the ranges of 20-150 kHz, 4-15 m/s, and up to 250 °C, respectively. The standard deviations for the droplet center of mass position both their diameter σ < 1 μm at the distance of 45 mm from the nozzle. Stable operation in the long-term (over 1.5 h) was demonstrated for a wide range of the droplet parameters: diameters, frequencies, and velocities. Physical factors affecting the stability of the generator operation have been identified. The technique for droplet synchronization, allowing using the droplet as a target for laser produced plasma, has been created; in particular, the generator has been successfully used in a high brightness extreme ultraviolet (EUV) light source. The operation with frequency up to 8 kHz was demonstrated as a result of the experimental simulation, which can provide an average brightness of the EUV source up to ˜1.2 kW/mm2 sr.

  10. Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

    CERN Document Server

    Corbella, Carles; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP).

  11. Validity of “sputtering and re-condensation” model in active screen cage plasma nitriding process

    Energy Technology Data Exchange (ETDEWEB)

    Saeed, A., E-mail: phyadi@gmail.com [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); National Centre for Physics, Quaid-i-Azam University Campus Islamabad 45320 (Pakistan); Khan, A.W. [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); National Centre for Physics, Quaid-i-Azam University Campus Islamabad 45320 (Pakistan); Jan, F. [Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan); Abrar, M. [Institute of Physics and Electronics, University of Peshawar, 25120 Peshawar (Pakistan); Khalid, M. [Department of Physics, Gomal University, 29050 D.I. Khan (Pakistan); Zakaullah, M. [Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan)

    2013-05-15

    The validity of “sputtering and re-condensation” model in active screen plasma nitriding for nitrogen mass transfer mechanism is investigated. The dominant species including NH, Fe-I, N{sub 2}{sup +}, N-I and N{sub 2} along with H{sub α} and H{sub β} lines are observed in the optical emission spectroscopy (OES) analysis. Active screen cage and dc plasma nitriding of AISI 316 stainless steel as function of treatment time is also investigated. The structure and phases composition of the nitrided layer is studied by X-ray diffraction (XRD). Surface morphology is studied by scanning electron microscopy (SEM) and hardness profile is obtained by Vicker's microhardness tester. Increasing trend in microhardness is observed in both cases but the increase in active screen plasma nitriding is about 3 times greater than that achieved by dc plasma nitriding. On the basis of metallurgical and OES observations the use of “sputtering and re-condensation” model in active screen plasma nitriding is tested.

  12. Enhancement of the crystalline Ge film growth by inductively coupled plasma-assisted pulsed DC sputtering.

    Science.gov (United States)

    Kim, Eunkyeom; Han, Seung-Hee

    2014-11-01

    The effect of pulsed DC sputtering on the crystalline growth of Ge thin film was investigated. Ge thin films were deposited on the glass substrates using ICP-assisted pulsed DC sputtering. The Ge target was sputtered using asymmetric bipolar pulsed DC sputtering system with and without assistance of ICP source. The pulse frequency of 200 Hz and the pulse on time of 500 μsec (duty cycle = 10%) were kept during sputtering process. Crystal structures were studied from X-ray diffraction. The X-ray diffraction patterns clearly showed crystalline film structures. The Ge thin films with randomly oriented crystalline were obtained using pulsed DC sputtering without ICP, whereas they had well aligned (220) orientation crystalline using ICP source. Moreover, the combination of ICP assistance and pulsed DC sputtering enhanced the growth of crystalline Ge thin films without hydrogen and metal by in situ deposition. The structure and lattice of the films were studied from TEM images. The cross-sectional TEM images revealed the deposited Ge films with columnar structure.

  13. Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi, E-mail: hamaguch@ppl.eng.osaka-u.ac.jp [Center for Atomic and Molecular Technologies, Osaka University, Yamadaoka 2-1, Suita 565-0871 (Japan); Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya [Device and Material R& D Group, RDS Platform, Sony Corporation, Kanagawa 243-0014 (Japan)

    2015-11-15

    Sputtering yields and surface chemical compositions of tin-doped indium oxide (or indium tin oxide, ITO) by CH{sup +}, CH{sub 3}{sup +}, and inert-gas ion (He{sup +}, Ne{sup +}, and Ar{sup +}) incidence have been obtained experimentally with the use of a mass-selected ion beam system and in-situ x-ray photoelectron spectroscopy. It has been found that etching of ITO is chemically enhanced by energetic incidence of hydrocarbon (CH{sub x}{sup +}) ions. At high incident energy incidence, it appears that carbon of incident ions predominantly reduce indium (In) of ITO and the ITO sputtering yields by CH{sup +} and CH{sub 3}{sup +} ions are found to be essentially equal. At lower incident energy (less than 500 eV or so), however, a hydrogen effect on ITO reduction is more pronounced and the ITO surface is more reduced by CH{sub 3}{sup +} ions than CH{sup +} ions. Although the surface is covered more with metallic In by low-energy incident CH{sub 3}{sup +} ions than CH{sup +} ions and metallic In is in general less resistant against physical sputtering than its oxide, the ITO sputtering yield by incident CH{sub 3}{sup +} ions is found to be lower than that by incident CH{sup +} ions in this energy range. A postulation to account for the relation between the observed sputtering yield and reduction of the ITO surface is also presented. The results presented here offer a better understanding of elementary surface reactions observed in reactive ion etching processes of ITO by hydrocarbon plasmas.

  14. Effect of nitrogen-containing plasma on adherence, friction, and wear of radiofrequency-sputtered titanium carbide coatings

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440C steel surfaces that were rf sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. Both X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that the small partial pressure of nitrogen (approximately 0.5 percent) markedly improves the adherence, friction, and wear properties when compared with coatings applied to sputter-etched surfaces, oxidized surfaces, or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  15. Use of a nitrogen-argon plasma to improve adherence of sputtered titanium carbide coatings on steel

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440-C steel surfaces that had been RF-sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that a small partial pressure of nitrogen (about 0.5%) markedly improves the adherence, friction, and wear properties when compared with coatings applied on sputter-etched oxidized surfaces or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  16. Adhesion of NiCu Films DC Biased Plasma-Sputter-Deposited on MgO (001)

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    NiCu films about 60nm thick were deposited on MgO (001) substrates at 230℃ by DC plasma-sputtering at 2.7kV and 8mA in pure Ar gas using a Ni90Cu10 target. A DC bias voltage of 0, 60, 110 or 140V was applied to the substrate during deposition. The adhesion of the film to the substrate was studied using a scratch test as a function of . The application of is very effective in increasing the adhesion of the film to the substrate. In conclusion, the adhesion increases with cleaning the substrate surface by sputtering off impurity admolecules during the film initial formation due to the energetic Ar ion particle bombardment.

  17. Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2008-01-01

    Full Text Available We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm and also using a semiconductor laser (λex=980 nm. Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

  18. Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sirghi, L., E-mail: lsirghi@uaic.ro [Department of Physics, Alexandru Ioan Cuza University, Blvd. Carol I, 11, Iasi, 700506 (Romania); Hatanaka, Y. [Research Institute of Electronics, Shizuoka University, 3-5-1, Johoku Naka-ku Hamamatsu, 432-8011 (Japan); Sakaguchi, K. [Faculty of Engineering, Aichi University of Technology, 50-2 Manori, Nishihazama, Gamagori, 443-0047 Aichi (Japan)

    2015-10-15

    Highlights: • TiOx thin films were deposited by radio frequency magnetron sputtering in Ar and Ar/H{sub 2}O plasma. • The deposited films contain OH groups in their bulk structure irrespective of the water content of the working gas. • The structure and photocatalytic activity of the deposited films were studied. - Abstract: The present work is investigating the photocatalytic activity of TiO{sub 2} thin films deposited by radiofrequency magnetron sputtering of a pure TiO{sub 2} target in Ar and Ar/H{sub 2}O (pressure ratio 40/3) plasmas. Optical absorption, structure, surface morphology and chemical structure of the deposited films were comparatively studied. The films were amorphous and included a large amount of hydroxyl groups (about 5% of oxygen atoms were bounded to hydrogen) irrespective of the intentional content of water in the deposition chamber. Incorporation of hydroxyl groups in the film deposited in pure Ar plasma is explained as contamination of the working gas with water molecules desorbed by plasma from the deposition chamber walls. However, intentional input of water vapour into the discharge chamber decreased the deposition speed and roughness of the deposited films. The good photocatalytic activity of the deposited films could be attributed hydroxyl groups in their structures.

  19. Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films

    Science.gov (United States)

    Hellgren, Niklas; Macák, Karol; Broitman, Esteban; Johansson, Mats P.; Hultman, Lars; Sundgren, Jan-Eric

    2000-07-01

    Carbon nitride CNx thin films were grown by unbalanced dc magnetron sputtering from a graphite target in a pure N2 discharge, and with the substrate temperature Ts kept between 100 and 550 °C. A solenoid coil positioned in the vicinity of the substrate was used to support the magnetic field of the magnetron, so that the plasma could be increased near the substrate. By varying the coil current and gas pressure, the energy distribution and fluxes of N2+ ions and C neutrals could be varied independently of each other over a wide range. An array of Langmuir probes in the substrate position was used to monitor the radial ion flux distribution over the 75-mm-diam substrate, while the flux and energy distribution of neutrals was estimated through Monte Carlo simulations. The structure, surface roughness, and mechanical response of the films are found to be strongly dependent on the substrate temperature, and the fluxes and energies of the deposited particles. By controlling the process parameters, the film structure can thus be selected to be amorphous, graphite-like or fullerene-like. When depositing at 3 mTorr N2 pressure, with Ts>200 °C, a transition from a disordered graphite-like to a hard and elastic fullerene-like structure occurred when the ion flux was increased above ˜0.5-1.0 mA/cm2. The nitrogen-to-carbon concentration ratio in the films ranged from ˜0.1 to 0.65, depending on substrate temperature and gas pressure. The nitrogen film concentration did, however, not change when varying the nitrogen ion-to-carbon atom flux ratios from ˜1 to 20.

  20. BN/BNSiO2 sputtering yield shape profiles under stationary plasma thruster operating conditions

    Directory of Open Access Journals (Sweden)

    M. Ranjan

    2016-09-01

    Full Text Available Quartz Crystal Microbalance (QCM is used to measure the volumetric and total sputtering yield of Boron Nitride (BN and Boron Nitride Silicon Dioxide (BNSiO2 bombarded by Xenon ions in the energy range of 100 eV to 550 eV. Sputtering yield shape profiles are reported at various angles of incidence 0-85° with surface normal and compared with modified Zhang model. The yield shape profile is found to be symmetric at normal incidence and asymmetric at oblique incidence. Both the materials show a sudden jump in the sputtering yield above 500 eV and at an angle of incidence in the range of 45-65°. Erosion of BN at as low as 74 eV ion energy is predicted using generalized Bohdansky model. BNSiO2 show a marginally higher sputtering yield compare to BN.

  1. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

    Science.gov (United States)

    Liang, SONG; Xianping, WANG; Le, WANG; Ying, ZHANG; Wang, LIU; Weibing, JIANG; Tao, ZHANG; Qianfeng, FANG; Changsong, LIU

    2017-04-01

    He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (∼17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

  2. Synthesis, transport, and retention of tin nanodroplets in a magnetron sputtering source combined with a capacitively-coupled plasma

    Science.gov (United States)

    Sasaki, K.; Takanari, K.

    2016-09-01

    The intention of this work was the development of a method for coating metal nanodroplets with thin films having high melting temperatures. To realize this process technology, we combined a magnetron sputtering plasma for synthesizing metal nanoparticles with a capacitively-coupled plasma (CCP) for retaining and heating synthesized nanoparticles. The magnetron sputtering source with a tin target was operated at a high pressure of 400 mTorr. The high pressure induced the condensation of tin atoms in the gas phase, resulting in the formation of tin nanoparticles. The nanoparticles were transported downward, and were trapped in the sheath electric field near the planar electrode for the CCP discharge. The formation, the transport, and the retention of nanoparticles were monitored by laser light scattering. Collected tin nanoparticles did not have agglomerated shapes, suggesting that tin nanoparticles were melted when they were stored in the CCP discharge. The surfaces of tin nanoparticles were oxidized. When we introduced methane before the collection, we observed core-shell nanoparticles without oxidization. Tin nanoparticles were coated with amorphous carbon films by plasma-enhanced chemical vapor deposition of methane.

  3. Plasma-Neutral Coupling on the Dark and Bright Sides of Antarctica

    Science.gov (United States)

    Chu, X.; Yu, Z.; Fong, W.; Chen, C.; Zhao, J.; Huang, W.; Roberts, B. R.; Fuller-Rowell, T. J.; Richmond, A. D.; Gerrard, A. J.; Weatherwax, A. T.; Gardner, C. S.

    2014-12-01

    The polar mesosphere and thermosphere provide a unique natural laboratory for studying the complex physical, chemical, neutral dynamical and electrodynamics processes in the Earth's atmosphere and space environment. McMurdo (geographic 77.83S, geomagnetic 80S) is located by the poleward edge of the aurora oval; so energetic particles may penetrate into the lower thermosphere and mesosphere along nearly vertical geomagnetic field lines. Lidar observations at McMurdo from December 2010 to 2014 have discovered several neutral atmosphere phenomena closely related to ionosphereic parameters and geomagnetic activity. For example, the diurnal tidal amplitude of temperatures not only increases super-exponentially from 100 to 110 km but also its growth rate becomes larger at larger Kp index. The lidar discovery of neutral iron (Fe) layers with gravity wave signatures in the thermosphere enabled the direct measurements of neutral temperatures from 30 to 170 km, revealing the neutral-ion coupling and aurora-enhanced Joule heating. A lidar 'marathon' of 174-hour continuous observations showed dramatic changes of composition (Fe atoms and ice particles) densities (over 40 times) in the mesopause region and their correlations to solar events. In this paper we will study the plasma-neutral coupling on the dark side of Antarctica via observation analysis and numerical modeling of the thermospheric Fe layers in the 100-200 km. A newly developed thermospheric Fe/Fe+ model is used to quantify how Fe+ ions are transported from their main deposition region to the E-F region and then neutralized to form Fe layers under dark polar conditions. We will also study the plasma-neutral coupling on the bright side of Antarctica via analyzing Fe events in summer. Complementary observations will be combined to show how the extreme changes of Fe layers are related to aurora particle precipitation and visible/sub-visible ice particles. These observations and studies will open new areas of

  4. Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hatada, R., E-mail: hatada@ca.tu-darmstadt.de [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Flege, S.; Bobrich, A.; Ensinger, W.; Dietz, C. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Baba, K. [Industrial Technology Center of Nagasaki, Applied Technology Division, Omura, Nagasaki 856-0026 (Japan); Sawase, T.; Watamoto, T. [Nagasaki University, Department of Applied Prosthodontics, Nagasaki 852-8523 (Japan); Matsutani, T. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Kinki University, Department of Electric and Electronic Engineering, Higashi-osaka 577-2332 (Japan)

    2014-08-15

    Highlights: • Deposition of Ag-containing diamond-like carbon films inside of tubes. • Combination of plasma source ion implantation and DC sputtering. • Antibacterial effect against S. aureus bacteria. - Abstract: Adhesive diamond-like carbon (DLC) films can be prepared by plasma source ion implantation (PSII), which is also suitable for the treatment of the inner surface of a tube. Incorporation of a metal into the DLC film provides a possibility to change the characteristics of the DLC film. One source for the metal is DC sputtering. In this study PSII and DC sputtering were combined to prepare DLC films containing low concentrations of Ag on the interior surfaces of stainless steel tubes. A DLC film was deposited using a C{sub 2}H{sub 4} plasma with the help of an auxiliary electrode inside of the tube. This electrode was then used as a target for the DC sputtering. A mixture of the gases Ar and C{sub 2}H{sub 4} was used to sputter the silver. By changing the gas flow ratios and process time, the resulting Ag content of the films could be varied. Sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, atomic force microscopy and Raman spectroscopy. Additionally, a ball-on-disk test was performed to investigate the tribological properties of the films. The antibacterial activity was determined using Staphylococcus aureus bacteria.

  5. Self-catalyzed carbon plasma-assisted growth of tin-doped indium oxide nanostructures by the sputtering method

    Science.gov (United States)

    Setti, Grazielle O.; de Jesus, Dosil P.; Joanni, Ednan

    2016-10-01

    In this work a new strategy for growth of nanostructured indium tin oxide (ITO) by RF sputtering is presented. ITO is deposited in the presence of a carbon plasma which reacts with the free oxygen atoms during the deposition, forming species like CO x . These species are removed from the chamber by the pumping system, and one-dimensional ITO nanostructures are formed without the need for a seed layer. Different values of substrate temperature and power applied to the gun containing the carbon target were investigated, resulting in different nanostructure morphologies. The samples containing a higher density of nanowires were covered with gold and evaluated as surface-enhanced Raman scattering substrates for detection of dye solutions. The concept might be applied to other oxides, providing a simple method for unidimensional nanostructural synthesis.

  6. Tunneling Magnetoresistance (TMR on Fe-Al2O3 Nano Granular Film Growth by Helicon Plasma Sputtering

    Directory of Open Access Journals (Sweden)

    S. Purwanto

    2008-01-01

    Full Text Available Fe-Al2O3 nanogranular thin film by helicon plasma sputtering with the variation of Fe content from 0.1 to 0.7 volume fraction have been prepared. The magnetic and magnetoresistance properties were investigated by a Vibrating Sample Magnetometer (VSM and a Four Point Probe (FPP. The Rutherford BackScattering (RBS was performed with the SIMNRA software. Conversion Electron Mossbauer Spectroscopy (CEMS study was also performed to estimate the fraction of Fe and α-Fe2O3 in the granular film. The results suggested that the percolation concentration occured at 0.55 Fe volume fractions, with the maximum Magnetoresistance (MR ratio of 3%. The present MR ratio that was lower than the previous results may be related to the existence of α-Fe2O3 phase.

  7. The Structure and Properties of Inductively Coupled Plasma Assisted Magnetron Sputtered Nanocrystalline NbN Coatings in Corrosion Protective Die Casting Molds.

    Science.gov (United States)

    Chun, Sung-Yong

    2016-02-01

    Niobium nitride coatings for the surface modified die casting molds with various ICP powers have been prepared using ICP assisted magnetron sputtering. The applied ICP power was varied from 0 to 200 W. The deposited coatings were characterized post-deposition using X-ray diffractometry (XRD) and atomic force microscopy (AFM). Single NbN phased coatings with nano-grain sized (hardness of each coating were evaluated from potentiostat and nanoindentator. Superior corrosion protective coatings in excess of 13.9 GPa were deposited with assistance of ICP plasma during sputtering.

  8. Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties

    Directory of Open Access Journals (Sweden)

    Stefan Flege

    2017-01-01

    Full Text Available Metal-containing diamond-like carbon (Me-DLC films were prepared by a combination of plasma source ion implantation (PSII and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4. The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.

  9. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Energy Technology Data Exchange (ETDEWEB)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

    2015-07-28

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  10. Plasma diagnostics of an Ar/NH{sub 3} direct-current reactive magnetron sputtering discharge for SiN{sub x} deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henry, F., E-mail: Fhenry@ulb.ac.be; Duluard, C.Y.; Batan, A.; Reniers, F., E-mail: Freniers@ulb.ac.be

    2012-08-01

    We have performed the deposition of silicon nitride thin films with the DC reactive magnetron sputtering technique from a silicon target in an Ar/NH{sub 3} gas mixture. Usually, the control of the process is carried out with discharge voltage measurements, which give information on the nature of the sputtering mode: metallic or reactive. To have a more complete view of the sputtering process, we have performed X-ray photoelectron spectroscopy (XPS) to investigate the chemistry of the silicon target racetrack and optical emission spectroscopy (OES) to investigate the Ar/NH{sub 3} gas phase near the target surface. When the NH{sub 3} molar fraction is increased, XPS measurements reveal the progressive formation of a silicon nitride layer on the target surface, thereby demonstrating a continuous transition to the reactive mode. OES measurements have highlighted the presence of several species which, according to the literature, are believed to be directly sputtered from the surface of the target: Si, SiH and SiN. Their intensities could be related to the chemical state of the target surface and provide a better insight into the sputtering process on the target surface. - Highlights: Black-Right-Pointing-Pointer Plasma diagnostics of Ar/NH{sub 3} DC reactive magnetron sputtering. Black-Right-Pointing-Pointer Multiple diagnostic techniques. Black-Right-Pointing-Pointer Poisoning of the target by formation of silicon nitride layer. Black-Right-Pointing-Pointer Relation between the light emitted by the plasma and the surface state of the target.

  11. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery.

    Science.gov (United States)

    Akazawa, Housei

    2016-06-01

    The branched-waveguide electron cyclotron resonance plasma sputtering apparatus places quartz windows for transmitting microwaves into the plasma source not in the line of sight of the target. However, the quartz windows must be replaced after some time of operation. For maintenance, the loop waveguide branching from the T-junction must be dismounted and re-assembled accurately, which is a time-consuming job. We investigated substituting the waveguide branches with two sets of coaxial cables and waveguide/coaxial cable converters to simplify assembly as far as connection and disconnection go. The resulting hybrid system worked well for the purposes of plasma generation and film deposition.

  12. Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering

    Science.gov (United States)

    Hatada, R.; Flege, S.; Bobrich, A.; Ensinger, W.; Dietz, C.; Baba, K.; Sawase, T.; Watamoto, T.; Matsutani, T.

    2014-08-01

    Adhesive diamond-like carbon (DLC) films can be prepared by plasma source ion implantation (PSII), which is also suitable for the treatment of the inner surface of a tube. Incorporation of a metal into the DLC film provides a possibility to change the characteristics of the DLC film. One source for the metal is DC sputtering. In this study PSII and DC sputtering were combined to prepare DLC films containing low concentrations of Ag on the interior surfaces of stainless steel tubes. A DLC film was deposited using a C2H4 plasma with the help of an auxiliary electrode inside of the tube. This electrode was then used as a target for the DC sputtering. A mixture of the gases Ar and C2H4 was used to sputter the silver. By changing the gas flow ratios and process time, the resulting Ag content of the films could be varied. Sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, atomic force microscopy and Raman spectroscopy. Additionally, a ball-on-disk test was performed to investigate the tribological properties of the films. The antibacterial activity was determined using Staphylococcus aureus bacteria.

  13. Analyses of the plasma generated by laser irradiation on sputtered target for determination of the thickness used for plasma generation

    Energy Technology Data Exchange (ETDEWEB)

    Kumaki, Masafumi, E-mail: masafumi.kumaki@riken.jp [Cooperative Major in Nuclear Energy, Waseda University, Shinjuku, Tokyo (Japan); RIKEN, Wako, Saitama (Japan); Ikeda, Shunsuke; Sekine, Megumi; Munemoto, Naoya [RIKEN, Wako, Saitama (Japan); Department of Energy Sciences, Tokyo Institute of Technology, Meguro, Tokyo (Japan); Fuwa, Yasuhiro [RIKEN, Wako, Saitama (Japan); Department of Physics and Astronomy, Kyoto University, Uji, Kyoto (Japan); Cinquegrani, David [American Nuclear Society, University of Michigan, Ann Arbor, Michigan 48109 (United States); Kanesue, Takeshi; Okamura, Masahiro [Collider-Accelerator Department, Brookhaven National Laboratory, Upton, New York 11973 (United States); Washio, Masakazu [Cooperative Major in Nuclear Energy, Waseda University, Shinjuku, Tokyo (Japan)

    2014-02-15

    In Brookhaven National Laboratory, laser ion source has been developed to provide heavy ion beams by using plasma generation with 1064 nm Nd:YAG laser irradiation onto solid targets. The laser energy is transferred to the target material and creates a crater on the surface. However, only the partial material can be turned into plasma state and the other portion is considered to be just vaporized. Since heat propagation in the target material requires more than typical laser irradiation period, which is typically several ns, only the certain depth of the layers may contribute to form the plasma. As a result, the depth is more than 500 nm because the base material Al ions were detected. On the other hand, the result of comparing each carbon thickness case suggests that the surface carbon layer is not contributed to generate plasma.

  14. Effects of ion irradiation on structural and magnetic properties of Fe/Si multilayers prepared by helicon plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Purwanto, Setyo E-mail: setyofzm@batan.go.id; Sakamoto, I. E-mail: isao-sakamoto@aist.go.jp; Koike, M.; Tanoue, H.; Honda, S

    2003-05-01

    Helicon plasma sputtering has been used to prepare Fe/Si MLs with an Fe layer thickness around t{sub Fe}=2-5 nm for a Si spacer fixed at the thickness of t{sub Si}=1 and 1.5 nm. Present study found that the Fe/Si MLs of the Si spacer thickness at t{sub Si}=1 nm exhibit antiferromagnetic nature, but the other Fe/Si MLs are ferromagnetic. The maximum value of magnetoresistance (MR) ratio in Fe/Si MLs appears at t{sub Fe}=3 nm, t{sub Si}=1 nm and is about 0.22%. We performed 400 keV Ar ion irradiation to investigate the behavior of magnetic properties in Fe/Si MLs. The magnetization measurements of Fe/Si MLs after 400 keV Ar ion irradiation show the degradation of antiferromagnetic behavior and the values of MR ratio after ion irradiation decrease. X-ray diffraction (XRD) patterns indicate that the peak intensity of a satellite peak originated in superlattice structure does not change within the range of ion dose used. These results imply that the interface structures after ion irradiation become rough although the superlattice structures remain. Therefore, we consider that the change of MR properties in Fe/Si MLs by 400 keV Ar ion irradiation is due to the thickness dependence of Si layers like metallic superlattice structures.

  15. Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source.

    Science.gov (United States)

    Malapit, Giovanni M; Mahinay, Christian Lorenz S; Poral, Matthew D; Ramos, Henry J

    2012-02-01

    A plasma sputter-type negative ion source is utilized to produce and detect negative Zr ions with energies between 150 and 450 eV via a retarding potential-type electrostatic energy analyzer. Traditional and modified semi-cylindrical Faraday cups (FC) inside the analyzer are employed to sample negative Zr ions and measure corresponding ion currents. The traditional FC registered indistinct ion current readings which are attributed to backscattering of ions and secondary electron emissions. The modified Faraday cup with biased repeller guard ring, cut out these signal distortions leaving only ringings as issues which are theoretically compensated by fitting a sigmoidal function into the data. The mean energy and energy spread are calculated using the ion current versus retarding potential data while the beam width values are determined from the data of the transverse measurement of ion current. The most energetic negative Zr ions yield tighter energy spread at 4.11 eV compared to the least energetic negative Zr ions at 4.79 eV. The smallest calculated beam width is 1.04 cm for the negative Zr ions with the highest mean energy indicating a more focused beam in contrast to the less energetic negative Zr ions due to space charge forces.

  16. Vehicle exhaust gas clearance by low temperature plasma-driven nano-titanium dioxide film prepared by radiofrequency magnetron sputtering.

    Directory of Open Access Journals (Sweden)

    Shuang Yu

    Full Text Available A novel plasma-driven catalysis (PDC reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2 film prepared by radiofrequency (RF magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover, this result was explained through optical emission spectrum. The O emission lines can be observed between 870 nm and 960 nm for wavelength in PDC reactor. Together with previous studies, it could be hypothesized that O derived from catalytically O3 destruction by catalyst might make a significant contribution to the much higher HC removal efficiency by PDC reactor. A series of complex chemical reactions caused by the multi-components mixture in real vehicle exhaust reduced NO removal efficiency. A controllable system with a real-time feedback module for the PDC reactor was proposed to further improve the ability of removing real vehicle exhaust gas.

  17. Vehicle exhaust gas clearance by low temperature plasma-driven nano-titanium dioxide film prepared by radiofrequency magnetron sputtering.

    Science.gov (United States)

    Yu, Shuang; Liang, Yongdong; Sun, Shujun; Zhang, Kai; Zhang, Jue; Fang, Jing

    2013-01-01

    A novel plasma-driven catalysis (PDC) reactor with special structure was proposed to remove vehicle exhaust gas. The PDC reactor which consisted of three quartz tubes and two copper electrodes was a coaxial dielectric barrier discharge (DBD) reactor. The inner and outer electrodes firmly surrounded the outer surface of the corresponding dielectric barrier layer in a spiral way, respectively. Nano-titanium dioxide (TiO2) film prepared by radiofrequency (RF) magnetron sputtering was coated on the outer wall of the middle quartz tube, separating the catalyst from the high voltage electrode. The spiral electrodes were designed to avoid overheating of microdischarges inside the PDC reactor. Continuous operation tests indicated that stable performance without deterioration of catalytic activity could last for more than 25 h. To verify the effectiveness of the PDC reactor, a non-thermal plasma(NTP) reactor was employed, which has the same structure as the PDC reactor but without the catalyst. The real vehicle exhaust gas was introduced into the PDC reactor and NTP reactor, respectively. After the treatment, compared with the result from NTP, the concentration of HC in the vehicle exhaust gas treated by PDC reactor reduced far more obviously while that of NO decreased only a little. Moreover, this result was explained through optical emission spectrum. The O emission lines can be observed between 870 nm and 960 nm for wavelength in PDC reactor. Together with previous studies, it could be hypothesized that O derived from catalytically O3 destruction by catalyst might make a significant contribution to the much higher HC removal efficiency by PDC reactor. A series of complex chemical reactions caused by the multi-components mixture in real vehicle exhaust reduced NO removal efficiency. A controllable system with a real-time feedback module for the PDC reactor was proposed to further improve the ability of removing real vehicle exhaust gas.

  18. Characterization and modelling of microwave multi dipole plasmas. Application to multi dipolar plasma assisted sputtering; Caracterization et modelisation des plasmas micro-onde multi-dipolaires. Application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, Tan Vinh [Universite Joseph Fourier/CNRS-IN2P3, 53 Avenue des Martyrs, F-38026 Grenoble (France)

    2006-07-01

    the magnet has also shown a better radial confinement with magnets exhibiting high length over diameter ratios. In addition, the numerical study corroborates the results of the experimental study, i.e. an ECR coupling region close to the equatorial plane of the magnet and not near the end of the coaxial microwave line. Finally, these results have been successfully applied to plasma assisted sputtering of targets allowing, in particular, their uniform erosion. (author)

  19. A New Type of Multielements-Doped, Carbon-based Materials Characterized by High-thermoconductiv ity, Low Chemical Sputtering, Low RES Yield and Exposure to Plasma

    Institute of Scientific and Technical Information of China (English)

    许增裕; 刘翔; 谌继明; 王明旭; 宋进仁; 翟更太; 李承新

    2002-01-01

    Low-Z materials, such as carbon-based materials and Be, are major plasma-facing material (PFM) for current, even in future fusion devices. In this paper, a new type of multielement-doped carbon-based materials developed are presented along with experimental re sults of their properties. The results indicate a decrease in chemical sputtering yield by one order of magnitude, a decrease in both thermal shock resistance and radiation-enhanced sublimation, an evidently lower temperature desorption spectrum, and combined properties of exposing to plasma.

  20. Bright and photostable push-pull pyrene dye visualizes lipid order variation between plasma and intracellular membranes

    Science.gov (United States)

    Niko, Yosuke; Didier, Pascal; Mely, Yves; Konishi, Gen-Ichi; Klymchenko, Andrey S.

    2016-01-01

    Imaging lipid organization in cell membranes requires advanced fluorescent probes. Here, we show that a recently synthesized push-pull pyrene (PA), similarly to popular probe Laurdan, changes the emission maximum as a function of lipid order, but outperforms it by spectroscopic properties. In addition to red-shifted absorption compatible with common 405 nm diode laser, PA shows higher brightness and much higher photostability than Laurdan in apolar membrane environments. Moreover, PA is compatible with two-photon excitation at wavelengths >800 nm, which was successfully used for ratiometric imaging of coexisting liquid ordered and disordered phases in giant unilamellar vesicles. Fluorescence confocal microscopy in Hela cells revealed that PA efficiently stains the plasma membrane and the intracellular membranes at >20-fold lower concentrations, as compared to Laurdan. Finally, ratiometric imaging using PA reveals variation of lipid order within different cellular compartments: plasma membranes are close to liquid ordered phase of model membranes composed of sphingomyelin and cholesterol, while intracellular membranes are much less ordered, matching well membranes composed of unsaturated phospholipids without cholesterol. These differences in the lipid order were confirmed by fluorescence lifetime imaging (FLIM) at the blue edge of PA emission band. PA probe constitutes thus a new powerful tool for biomembrane research.

  1. Structure of Pt/C and PtRu/C catalytic layers prepared by plasma sputtering and electric performance in direct methanol fuel cells (DMFC)

    Energy Technology Data Exchange (ETDEWEB)

    Caillard, A.; Brault, P.; Mathias, J. [Groupe de Recherche sur l' Energetique des Milieux Ionises, UMR6606 Universite d' Orleans, CNRS, Polytech' Orleans BP6744, F-45067 Orleans Cedex 2 (France); Coutanceau, C.; Leger, J.-M. [Laboratoire de Catalyse en Chimie Organique, UMR6503 Universite de Poitiers, CNRS, F-86022 Poitiers (France)

    2006-11-08

    Plasma sputtering process was used to deposit Pt and PtRu on conductive carbon diffusion layer. Low metal loading catalysts for methanol electrooxidation were prepared and characterized by TEM and XRD. The main result is that codeposition of Pt and Ru leads to alloy phase, whereas multi-layers deposition leads to no-alloyed structure. The electrochemical performance of sputtered Pt/C electrodes was compared with that of standard electrodes, and was found lower. However, the specific activity was much higher, indicating that the catalyst utilization efficiency was higher than that obtained with a standard electrode. Then, different bimetallic PtRu/C electrodes were prepared by plasma sputtering, leading to different catalyst structures (Pt and Ru multilayer deposition or simultaneous deposition of Pt and Ru) and composition (from 100:0 to 50:50 Pt/Ru atomic ratios). At last, the different PtRu electrodes were compared in term of DMFC electrical performance. The best efficiency of the DMFC was reached when both metals Pt and Ru are simultaneously deposited (alloyed) with a ruthenium atomic ratio of 30% or 40 % Ru depending of the working potentials of the cell. (author)

  2. Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

    Energy Technology Data Exchange (ETDEWEB)

    Rashid, Nur Maisarah Abdul, E-mail: nurmaisarahrashid@gmail.com [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Muhamad, Muhamad Rasat [Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Rahman, Saadah Abdul, E-mail: saadah@um.edu.my [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2013-02-01

    Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carbon films with the added advantage of eliminating the use of highly toxic silane gas in the deposition process. Silicon (Si) atoms were sputtered from a pure amorphous silicon (a-Si) target by argon (Ar) ions and carbon (C) atoms were incorporated into the film from C based growth radicals generated through the discharge of methane (CH{sub 4}) gas. The effects of r.f. powers of 60, 80, 100, 120 and 150 W applied during the deposition process on the structural and optical properties of the films were investigated. Raman spectroscopic studies showed that the silicon carbon films contain amorphous silicon carbide (SiC) and amorphous carbon (a-C) phases. The r.f. power showed significant influence on the C incorporation in the film structure. The a-C phases became more ordered in films with high C incorporation in the film structure. These films also produced high photoluminescence emission intensity at around 600 nm wavelength as a result of quantum confinement effects from the presence of sp{sup 2} C clusters embedded in the a-SiC and a-C phases in the films. - Highlights: ► Effects of radio frequency (r.f.) power on silicon carbon (SiC) films were studied. ► Hybrid plasma enhanced chemical vapor deposition/sputtering technique was used. ► r.f. power influences C incorporation in the film structure. ► High C incorporation results in higher ordering of the amorphous C phase. ► These films produced high photoluminescence emission intensity.

  3. Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubesa)

    Science.gov (United States)

    Hershcovitch, A.; Blaskiewicz, M.; Brennan, J. M.; Custer, A.; Dingus, A.; Erickson, M.; Fischer, W.; Jamshidi, N.; Laping, R.; Liaw, C.-J.; Meng, W.; Poole, H. J.; Todd, R.

    2015-05-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed, fabricated, and operated. The reason for this endeavor is to alleviate the problems of unacceptable resistive heating of stainless steel vacuum tubes in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase the cathode lifetime, a movable magnet package was developed, and the thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced secondary electron yield to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that a 10 μm copper coated stainless steel RHIC tube has a conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. The device details and experimental results are described.

  4. Plasma Sputtering Robotic Device for In-Situ Thick Coatings of Long, Small Diameter Vacuum Tubes

    Science.gov (United States)

    Hershcovitch, Ady

    2014-10-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed fabricated & operated. Reason for this endeavor is to alleviate the problems of unacceptable ohmic heating of stainless steel vacuum tubes and of electron clouds, due to high secondary electron yield (SEY), in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase cathode lifetime, movable magnet package was developed, and thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced SEY to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that 10 μm Cu coated stainless steel RHIC tube has conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. Device detail and experimental results will be presented. Work supported by Brookhaven Science Associates, LLC under

  5. Study of sterilization-treatment in pure and N- doped carbon thin films synthesized by inductively coupled plasma assisted pulsed-DC magnetron sputtering

    Science.gov (United States)

    Javid, Amjed; Kumar, Manish; Han, Jeon Geon

    2017-01-01

    Electrically-conductive nanocrystalline carbon films, having non-toxic and non-immunogenic characteristics, are promising candidates for reusable medical devices. Here, the pure and N- doped nanocrystalline carbon films are deposited by the assistance of inductively coupled plasma (ICP) in an unbalanced facing target pulsed-DC magnetron sputtering process. Through the optical emission spectroscopy study, the role of ICP assistance and N-doping on the reactive components/radicals during the synthesis is presented. The N-doping enhances the three fold bonding configurations by increasing the ionization and energies of the plasma species. Whereas, the ICP addition increases the plasma density to control the deposition rate and film structure. As a result, sputtering-throughput (deposition rate: 31-55 nm/min), electrical resistivity (4-72 Ωcm) and water contact angle (45.12°-54°) are significantly tailored. Electric transport study across the surface microchannel confirms the superiority of N-doped carbon films for sterilization stability over the undoped carbon films.

  6. Thin films of thermoelectric compound Mg{sub 2}Sn deposited by co-sputtering assisted by multi-dipolar microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Le-Quoc, H., E-mail: huy.le-quoc@lpsc.in2p3.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Lacoste, A., E-mail: ana.lacoste@ujf-grenoble.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Hlil, E.K. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Bes, A.; Vinh, T. Tan [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Fruchart, D. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Skryabina, N. [Department of Physics, Perm State University, 614990 Perm (Russian Federation)

    2011-10-13

    Highlights: > Mg{sub 2}Sn thin films deposited by plasma co-sputtering, on silicon and glass substrates. > Formation of nano-grained polycrystalline films on substrates at room temperature. > Structural properties vary with target biasing and target-substrate distance. > Formation of the hexagonal phase of Mg{sub 2}Sn in certain deposition conditions. > Power factor {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn films doped with {approx}1 at.% Ag. - Abstract: Magnesium stannide (Mg{sub 2}Sn) thin films doped with Ag intended for thermoelectric applications are deposited on both silicon and glass substrates at room temperature by plasma assisted co-sputtering. Characterization by scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffraction confirms the formation of fine-grained polycrystalline thin films with thickness of 1-3 {mu}m. Stoichiometry, microstructure and crystal structure of thin films are found to vary with target biasing and the distance from targets to substrate. Measurements of electrical resistivity and Seebeck coefficient at room temperature show the maximum power factor of {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn thin films doped with {approx}1 at.% Ag.

  7. Stress-induced VO{sub 2} films with M2 monoclinic phase stable at room temperature grown by inductively coupled plasma-assisted reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Okimura, Kunio; Watanabe, Tomo [School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292 (Japan); Sakai, Joe [GREMAN, UMR 7347 CNRS, Universite Francois Rabelais de Tours, Parc de Grandmont 37200 Tours (France)

    2012-04-01

    We report on growth of VO{sub 2} films with M2 monoclinic phase stable at room temperature under atmospheric pressure. The films were grown on quartz glass and Si substrates by using an inductively coupled plasma-assisted reactive sputtering method. XRD-sin{sup 2}{Psi} measurements revealed that the films with M2 phase are under compressive stress in contrast to tensile stress of films with M1 phase. Scanning electron microscopy observations revealed characteristic crystal grain aspects with formation of periodical twin structure of M2 phase. Structural phase transition from M2 to tetragonal phases, accompanied by a resistance change, was confirmed to occur as the temperature rises. Growth of VO{sub 2} films composed of M2 phase crystalline is of strong interest for clarifying nature of Mott transition of strongly correlated materials.

  8. High-k gadolinium scandate on Si obtained by high pressure sputtering from metal targets and in-situ plasma oxidation

    Science.gov (United States)

    Pampillón, M. A.; San Andrés, E.; Feijoo, P. C.; Fierro, J. L. G.

    2017-03-01

    This article studies the physical and electrical behavior of Gd2‑x Sc x O3 layers grown by high pressure sputtering from metallic Gd and Sc targets. The aim is to obtain a high permittivity dielectric for microelectronic applications. The films were obtained by the deposition of a metallic nanolaminate of Gd and Sc alternating layers, which is afterwards in-situ oxidized by plasma. The oxide films obtained were close to stoichiometry, amorphous and with minimal interfacial regrowth. By fabricating metal–insulator–semiconductor capacitors we found that a moderate temperature annealing is needed to enhance permittivity, which reaches a high value of 32 while keeping moderate leakage. Finally, the feasibility of interface scavenging in this material with Ti gate electrodes is also demonstrated.

  9. Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4 target

    Science.gov (United States)

    Nafarizal, Nayan; Sasaki, Koichi

    2016-07-01

    Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas were measured by ultraviolet absorption spectroscopy and vacuum ultraviolet absorption spectroscopy. A stoichiometric Cu2ZnSnS4 (CZTS) target was used in this work. It was found that, at various Ar pressures, the S density ranged between (2-8) × 1010 cm-3, the Cu and Sn densities ranged between (0.6-3) × 1010 cm-3, and the Zn density ranged between (2-3) × 109 cm-3. The effective depositing flux, which was evaluated from the absolute densities and the sticking probabilities, was comparable with that evaluated from the deposition rate of the CZTS film. However, the composition ratio of Cu, Zn, Sn, and S in the gas phase deviated from the ideal stoichiometry of CZTS. We discussed the possible mechanisms for the difference among the element compositions of the target, the deposited film, and the gas-phase densities.

  10. Structure and deuterium retention properties of tungsten layers deposited by plasma sputtering in a mixed atmosphere of D2 and He

    Science.gov (United States)

    Tang, X. H.; Shi, L. Q.; O'Connor, D. J.; King, B.

    2014-03-01

    The influence of the deposition conditions on the surface morphology, crystal structure and deuterium retention of the tungsten layers formed by rf magnetron plasma sputtering in mixed atmosphere of D2, He and Ar, has been carried out. Helium containing deuterated tungsten layers (named He-WDx) on Cu/Si substrate demonstrate serious film damages with zones of cracks, fractures, flaking-off and large surface blisters. However, these kinds of damages do not happen on the He-WDx layers performed on mechanically polished polycrystalline Cu substrates because of larger surface roughness of the substrates. The crystal structure of the W layer greatly changes with the additional He in the layer, and large amounts of defects resulting in lattice expansion and X-diffraction peak broadening were produced in the W crystal. He in the W layer has direct impacts on D retention. Both D and He concentrations vary simultaneously with He fraction, attached negative bias and substrate temperature.

  11. On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

    Science.gov (United States)

    Zheng, B. C.; Meng, D.; Che, H. L.; Lei, M. K.

    2015-05-01

    The modulated pulsed power magnetron sputtering (MPPMS) discharge processes are numerically modeled and experimentally investigated, in order to explore the effect of the pressure on MPPMS discharges as well as on the microstructure of the deposited thin films. A global plasma model has been developed based on a volume-averaged global description of the ionization region, considering the loss of electrons by cross-B diffusion. The temporal variations of internal plasma parameters at different pressures from 0.1 to 0.7 Pa are obtained by fitting the model to duplicate the experimental discharge data, and Cu thin films are deposited by MPPMS at the corresponding pressures. The surface morphology, grain size and orientation, and microstructure of the deposited thin films are investigated by scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. By increasing the pressure from 0.1 to 0.7 Pa, both the ion bombardment energy and substrate temperature which are estimated by the modeled plasma parameters decrease, corresponding to the observed transition of the deposited thin films from a void free structure with a wide distribution of grain size (zone T) into an underdense structure with a fine fiber texture (zone 1) in the extended structure zone diagram (SZD). The microstructure and texture transition of Cu thin films are well-explained by the extended SZD, suggesting that the primary plasma processes are properly incorporated in the model. The results contribute to the understanding of the characteristics of MPPMS discharges, as well as its correlation with the microstructure and texture of deposited Cu thin films.

  12. Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kikuchi, Yoshiaki, E-mail: kikuchi.y.ao@m.titech.ac.jp; Gao, Jun; Sano, Takahiro; Ohmi, Shun-ichiro, E-mail: ohmi@ep.titech.ac.jp

    2012-01-31

    A high-k/metal gate structure has been investigated for application to state-of-the-art metal-oxide-semiconductor field-effect transistors. In the high-k/metal gate structure, the 32-nm technology node was realized by using the high-k-last, metal-last integration process. We investigated anisotropic deposition for 3-dimensional gate structures on Si substrates utilizing electron-cyclotron-resonance plasma sputtering to reduce parasitic capacitance. Anisotropic HfN film deposition was realized and the deposition thickness on the side wall was reduced with decreasing sputtering gas pressure, from 0.15 to 0.06 Pa, corresponding to Ar/N{sub 2} flow ratios of 20/1 and 5/1 sccm. The HfSiON gate insulator formed from the anisotropically deposited HfN film showed an equivalent-oxide-thickness of 2.1 nm and a gate leakage of 3.1 Multiplication-Sign 10{sup -6}A/cm{sup 2} at V{sub FB}-1.0. - Highlights: Black-Right-Pointing-Pointer High-k film deposition was controlled by the deposition pressure. Black-Right-Pointing-Pointer The pressure decreases with a reduction of gas flow rate during the high-k film deposition. Black-Right-Pointing-Pointer A flat band voltage shows negative shifts with reduction of gas flow rates. Black-Right-Pointing-Pointer A reason of the flat band voltage shift is an increase in Si-N bonding.

  13. Generation of bright attosecond x-ray pulse trains via Thomson scattering from laser-plasma accelerators.

    Science.gov (United States)

    Luo, W; Yu, T P; Chen, M; Song, Y M; Zhu, Z C; Ma, Y Y; Zhuo, H B

    2014-12-29

    Generation of attosecond x-ray pulse attracts more and more attention within the advanced light source user community due to its potentially wide applications. Here we propose an all-optical scheme to generate bright, attosecond hard x-ray pulse trains by Thomson backscattering of similarly structured electron beams produced in a vacuum channel by a tightly focused laser pulse. Design parameters for a proof-of-concept experiment are presented and demonstrated by using a particle-in-cell code and a four-dimensional laser-Compton scattering simulation code to model both the laser-based electron acceleration and Thomson scattering processes. Trains of 200 attosecond duration hard x-ray pulses holding stable longitudinal spacing with photon energies approaching 50 keV and maximum achievable peak brightness up to 1020 photons/s/mm2/mrad2/0.1%BW for each micro-bunch are observed. The suggested physical scheme for attosecond x-ray pulse trains generation may directly access the fastest time scales relevant to electron dynamics in atoms, molecules and materials.

  14. Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS

    Science.gov (United States)

    Hänninen, Tuomas; Schmidt, Susann; Wissting, Jonas; Jensen, Jens; Hultman, Lars; Högberg, Hans

    2016-04-01

    Silicon oxynitride (SiO x N y , x=0.2-1.3, y=0.2 -0.7) thin films were synthesized by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O atmospheres. It was found that the composition of the material can be controlled by the reactive gas flow and the average target power. X-ray photoelectron spectroscopy (XPS) shows that high average powers result in more silicon-rich films, while lower target powers yield silicon-oxide-like material due to more pronounced target poisoning. The amount of nitrogen in the films can be controlled by the percentage of nitrous oxide in the working gas. The nitrogen content remains at a constant level while the target is operated in the transition region between metallic and poisoned target surface conditions. The extent of target poisoning is gauged by the changes in peak target current under the different deposition conditions. XPS also shows that varying concentrations and ratios of oxygen and nitrogen in the films result in film chemical bonding structures ranging from silicon-rich to stoichiometric silicon oxynitrides having no observable Si-Si bond contributions. Spectroscopic ellipsometry shows that the film optical properties depend on the amount and ratio of oxygen and nitrogen in the compound, with film refractive indices measured at 633 nm ranging between those of SiO2 and Si3N4.

  15. Linear and nonlinear optical properties of functionalized CdSe quantum dots prepared by plasma sputtering and wet chemistry.

    Science.gov (United States)

    Humbert, Christophe; Dahi, Abdellatif; Dalstein, Laetitia; Busson, Bertrand; Lismont, Marjorie; Colson, Pierre; Dreesen, Laurent

    2015-05-01

    We develop an innovative manufacturing process, based on radio-frequency magnetron sputtering (RFMS), to prepare neat CdSe quantum dots (QDs) on glass and silicon substrates and further chemically functionalize them. In order to validate the fabrication protocol, their optical properties are compared with those of QDs obtained from commercial solutions and deposited by wet chemistry on the substrates. Firstly, AFM measurements attest that nano-objects with a mean diameter around 13 nm are located on the substrate after RFMS treatment. Secondly, the UV-Vis absorption study of this deposited layer shows a specific optical absorption band, located at 550 nm, which is related to a discrete energy level of QDs. Thirdly, by using two-color sum-frequency generation (2C-SFG) nonlinear optical spectroscopy, we show experimentally the functionalization efficiency of the RFMS CdSe QDs layer with thiol derived molecules, which is not possible on the QDs layer prepared by wet chemistry due to the surfactant molecules from the native solution. Finally, 2C-SFG spectroscopy, performed at different visible wavelengths, highlights modifications of the vibration mode shape whatever the QDs deposition method, which is correlated to the discrete energy level of the QDs.

  16. Flexible Solar Cells Using Doped Crystalline Si Film Prepared by Self-Biased Sputtering Solid Doping Source in SiCl4/H2 Microwave Plasma.

    Science.gov (United States)

    Hsieh, Ping-Yen; Lee, Chi-Young; Tai, Nyan-Hwa

    2016-02-01

    We developed an innovative approach of self-biased sputtering solid doping source process to synthesize doped crystalline Si film on flexible polyimide (PI) substrate via microwave-plasma-enhanced chemical vapor deposition (MWPECVD) using SiCl4/H2 mixture. In this process, P dopants or B dopants were introduced by sputtering the solid doping target through charged-ion bombardment in situ during high-density microwave plasma deposition. A strong correlation between the number of solid doping targets and the characteristics of doped Si films was investigated in detail. The results show that both P- and B-doped crystalline Si films possessed a dense columnar structure, and the crystallinity of these structures decreased with increasing the number of solid doping targets. The films also exhibited a high growth rate (>4.0 nm/s). Under optimal conditions, the maximum conductivity and corresponding carrier concentration were, respectively, 9.48 S/cm and 1.2 × 10(20) cm(-3) for P-doped Si film and 7.83 S/cm and 1.5 × 10(20) cm(-3) for B-doped Si film. Such high values indicate that the incorporation of dopant with high doping efficiency (around 40%) into the Si films was achieved regardless of solid doping sources used. Furthermore, a flexible crystalline Si film solar cell with substrate configuration was fabricated by using the structure of PI/Mo film/n-type Si film/i-type Si film/p-type Si film/ITO film/Al grid film. The best solar cell performance was obtained with an open-circuit voltage of 0.54 V, short-circuit current density of 19.18 mA/cm(2), fill factor of 0.65, and high energy conversion of 6.75%. According to the results of bending tests, the critical radius of curvature (RC) was 12.4 mm, and the loss of efficiency was less than 1% after the cyclic bending test for 100 cycles at RC, indicating superior flexibility and bending durability. These results represent important steps toward a low-cost approach to high-performance flexible crystalline Si film

  17. Generation of High Brightness Electron Beams via Ionization Induced Injection by Transverse Colliding Lasers in a Beam-Driven Plasma Wakefield Accelerator

    CERN Document Server

    Li, F; Xu, X L; Zhang, C J; Yan, L X; Du, Y C; Huang, W H; Cheng, H B; Tang, C X; Lu, W; Joshi, C; Mori, W B; Gu, Y Q

    2013-01-01

    The production of ultra-bright electron bunches using ionization injection triggered by two transversely colliding laser pulses inside a beam-driven plasma wake is examined via three-dimensional (3D) particle-in-cell (PIC) simulations. The relatively low intensity lasers are polarized along the wake axis and overlap with the wake for a very short time. The result is that the residual momentum of the ionized electrons in the transverse plane of the wake is much reduced and the injection is localized along the propagation axis of the wake. This minimizes both the initial 'thermal' emittance and the emittance growth due to transverse phase mixing. 3D PIC simulations show that ultra-short (around 8 fs) high-current (0.4 kA) electron bunches with a normalized emittance of 8.5 and 6 nm in the two planes respectively and a brightness greater than 1.7*10e19 A rad-2 m-2 can be obtained for realistic parameters.

  18. Nonlinear Dynamics of High-Brightness Electron Beams and Beam-Plasma Interactions: Theories, Simulations, and Experiments

    Energy Technology Data Exchange (ETDEWEB)

    C. L. Bohn (deceased), P. Piot and B. Erdelyi

    2008-05-31

    According to its original Statement of Work (SOW), the overarching objective of this project is: 'To enhance substantially the understanding of the fundamental dynamics of nonequilibrium high-brightness beams with space charge.' Our work and results over the past three and half years have been both intense and fruitful. Inasmuch as this project is inextricably linked to a larger, growing research program - that of the Beam Physics and Astrophysics Group (BPAG) - the progress that it has made possible cannot easily be separated from the global picture. Thus, this summary report includes major sections on 'global' developments and on those that can be regarded as specific to this project.

  19. High-brightness laser plasma soft X-ray source using a double-stream gas puff target irradiated with the Prague Asterix Laser System (PALS)

    Energy Technology Data Exchange (ETDEWEB)

    Fiedorowicz, H.; Bartnik, A.; Juha, L.; Jungwirth, K.; Kralikova, B.; Krasa, J.; Kubat, P.; Pfeifer, M.; Pina, L.; Prchal, P.; Rohlena, K.; Skala, J.; Ullschmied, J.; Horvath, M.; Wawer, J

    2004-01-14

    High brightness laser plasma soft X-ray source based on a recently developed double-stream gas puff target irradiated with 0.5 ns laser pulses with energies up to 700 J from the Prague Asterix Laser System (PALS) is presented. The gas puff target was created by pulsed injection of xenon into a hollow stream of helium using an electromagnetic valve system with the double-nozzle setup. Soft X-ray emission was measured using the transmission grating spectrograph coupled to a CCD camera and the calibrated silicon photodiodes. The absolute soft X-ray production was determined to be 160 J for 540 J of laser energy, giving the soft X-ray conversion efficiency of about 30%. The source has been used in initial experiments on soft X-ray ablation of organic polymers and elemental solids.

  20. Direct dynamic synthesis of nanodispersed phases of titanium oxides upon sputtering of electrodischarge titanium plasma into an air atmosphere

    Science.gov (United States)

    Sivkov, A. A.; Gerasimov, D. Yu.; Nikitin, D. S.

    2017-01-01

    Experimental investigations of the possibility of directly synthesizing nanodispersed crystalline phases of titanium dioxides with rutile and anatase structures in a hypervelocity jet of electroerosion plasma generated by a coaxial magnetoplasma accelerator with titanium electrodes are presented. A powder product containing nanosized polymorphic phases of titanium dioxide with a spherical shape of particles has been manufactured.

  1. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-01

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  2. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing.

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-21

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  3. Sputtering and surface damage of TFTR protective plate materials (Mo, TZM, graphite) by energetic D/sup +/ ion irradiation. Final report for Princeton Plasma Physics Laboratory

    Energy Technology Data Exchange (ETDEWEB)

    Kaminsky, M.; Das, S.K.; Dusza, P.

    1978-03-01

    Studies have been conducted in accordance with a service request from the Plasma Physics Laboratory (PPPL) of Princeton University to determine the total sputtering yields and the surface damage of molybdenum (a candidate material for the neutral beam injector protective plate for Princeton's Fusion Test Reactor (TFTR)) caused by the impact of D/sup +/ ions at 120-keV, 60-keV and 40-keV at fluxes and total doses agreed upon between PPPL and ANL. The irradiations have been conducted in a specified pulsed mode as well as in a dc mode. The material TZM (a molybdenum alloy) was included in some tests of surface damage, but not for the full complement of doses planned for molybdenum. According to a request by PPPL the target temperature was not to be controlled (targets were allowed to reach a temperature determined by the beam power deposition and the conductive and radiative heat losses), but the target temperature was to be monitored. The irradiations were conducted at pressures ranging from 4 x 10/sup -9/ torr to 2 x 10/sup -8/ torr.

  4. Transport of Sputtered Particles in Capacitive Sputter Sources

    CERN Document Server

    Trieschmann, Jan

    2015-01-01

    The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum. An angular dependent Thompson energy distribution is fitted to results from Monte-Carlo simulations and used for the kinetic simulation of the transport of sputtered aluminum. For the proposed configuration the transport of sputtered particles is characterized under typical process conditions at a gas pressure of p = 0.5 Pa. It is found that - due to the peculiar geometric conditions - the transport can be understood in a one dimensional picture, governed by the interaction of the imposed and backscattered particle fluxes. It is shown that the precise geometric features play an important role only in proximity to the electrode edges, where the effect of backscattering from the outside chamber volume be...

  5. Synthesis and annealing effects on the properties of nanostructured Ti–Al–V–N coatings deposited by plasma enhanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Abd El-Rahman, A.M., E-mail: ahmedphys96@hotmail.com [Physics Department, Faculty of Science, Sohag University, 82524 Sohag (Egypt); Mechanical and Materials Engineering Division, Southwest Research Institute, 6220 Culebra Road, San Antonio, TX 78238 (United States)

    2015-01-15

    In the present study, Ti–Al–V–N coatings were synthesized onto Ti–6Al–4V substrates by plasma enhanced magnetron sputtering (PEMS) of two commercial sputter targets of Ti–6Al–4V in an Ar/N{sub 2} gas mixture. After that, the as-synthesized coatings were annealed in air atmosphere at temperature ranging from 500 °C to 900 °C. The as-synthesized and annealed coatings were characterized by X-ray diffraction, Vickers microhardness tester, ball-on-disk tribometer and potentiodynamic polarization tests. The as-synthesized coatings showed a surface hardness of about 2980 ± 80 HV{sub 0.3} and a friction coefficient of 0.36. It has been revealed with the increase of annealing temperature; the microhardness was gradually decreased and reached a minimum value of 1030 ± 30 HV{sub 0.3} at 900 °C. The coefficient of friction has a minimum value of 0.27 for coatings annealed at 600 °C. Potentiodynamic polarization test confirmed that thermally annealed samples (≤600 °C) exhibit a better corrosion performance compared to that of the as-synthesized one. However, at relatively higher annealing temperature (700–900 °C), a small degradation in the corrosion performance was observed with the formation of oxidized phases. Finally, the variation in the mechanical and tribological properties of this coating with annealing temperatures is attributed to changes in microstructure and chemical nature of the surface layer. - Highlights: • Ti–Al–V–N coating was synthesized using PEMS and annealed in air atmosphere. • The microstructural, mechanical and tribological properties were evaluated. • The as-synthesized coating showed surface hardness of about 30 GPa. • Grain size and microstrain were obtained from microstructural data. • The annealed samples (≤600 °C) exhibit good thermal stability and better corrosion performance.

  6. Nanostructured plasma etched, magnetron sputtered nanolaminar Cr{sub 2}AlC MAX phase thin films

    Energy Technology Data Exchange (ETDEWEB)

    Grieseler, Rolf, E-mail: rolf.grieseler@tu-ilmenau.de [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Hähnlein, Bernd; Stubenrauch, Mike [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Kups, Thomas [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Wilke, Marcus [MFPA Weimar, Testing Center for Thin Films and Material Properties at TU Ilmenau, Gustav-Kirchhoff-Str. 5, Ilmenau (Germany); Hopfeld, Marcus [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Pezoldt, Jörg [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Schaaf, Peter [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany)

    2014-02-15

    The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr{sub 2}AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

  7. Magnetron sputtering source

    Science.gov (United States)

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  8. Low-loss interference filter arrays made by plasma-assisted reactive magnetron sputtering (PARMS) for high-performance multispectral imaging

    Science.gov (United States)

    Broßmann, Jan; Best, Thorsten; Bauer, Thomas; Jakobs, Stefan; Eisenhammer, Thomas

    2016-10-01

    Optical remote sensing of the earth from air and space typically utilizes several channels in the visible and near infrared spectrum. Thin-film optical interference filters, mostly of narrow bandpass type, are applied to select these channels. The filters are arranged in filter wheels, arrays of discrete stripe filters mounted in frames, or patterned arrays on a monolithic substrate. Such multi-channel filter assemblies can be mounted close to the detector, which allows a compact and lightweight camera design. Recent progress in image resolution and sensor sensitivity requires improvements of the optical filter performance. Higher demands placed on blocking in the UV and NIR and in between the spectral channels, in-band transmission and filter edge steepness as well as scattering lead to more complex filter coatings with thicknesses in the range of 10 - 25μm. Technological limits of the conventionally used ion-assisted evaporation process (IAD) can be overcome only by more precise and higher-energetic coating technologies like plasma-assisted reactive magnetron sputtering (PARMS) in combination with optical broadband monitoring. Optics Balzers has developed a photolithographic patterning process for coating thicknesses up to 15μm that is fully compatible with the advanced PARMS coating technology. This provides the possibility of depositing multiple complex high-performance filters on a monolithic substrate. We present an overview of the performance of recently developed filters with improved spectral performance designed for both monolithic filter-arrays and stripe filters mounted in frames. The pros and cons as well as the resulting limits of the filter designs for both configurations are discussed.

  9. Characterization and modeling of multi-dipolar microwave plasmas: application to multi-dipolar plasma assisted sputtering; Caracterisation et modelisation des plasmas micro-onde multi-dipolaires: application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, T.V

    2006-12-15

    The scaling up of plasma processes in the low pressure range remains a question to be solved for their rise at the industrial level. One solution is the uniform distribution of elementary plasma sources where the plasma is produced via electron cyclotron resonance (ECR) coupling. These elementary plasma sources are made up of a cylindrical permanent magnet (magnetic dipole) set at the end of a coaxial microwave line. Although of simple concept, the optimisation of these dipolar plasma sources is in fact a complex problem. It requires the knowledge, on one hand, of the configurations of static magnetic fields and microwave electric fields, and, on the other hand, of the mechanisms of plasma production in the region of high intensity magnetic field (ECR condition), and of plasma diffusion. Therefore, the experimental characterisation of the operating ranges and plasma parameters has been performed by Langmuir probes and optical emission spectroscopy on different configurations of dipolar sources. At the same time, in a first analytical approach, calculations have been made on simple magnetic field configurations, motion and trajectory of electrons in these magnetic fields, and the acceleration of electrons by ECR coupling. Then, the results have been used for the validation of the numerical modelling of the electron trajectories by using a hybrid PIC (particle-in-cell) / MC (Monte Carlo) method. The experimental study has evidenced large operating domains, between 15 and 200 W of microwave power, and from 0.5 to 15 mtorr argon pressure. The analysis of plasma parameters has shown that the region of ECR coupling is localised near the equatorial plane of the magnet and dependent on magnet geometry. These characterizations, applied to a cylindrical reactor using 48 sources, have shown that densities between 10{sup 11} and 10{sup 12} cm{sup -3} could be achieved in the central part of the volume at a few mtorr argon pressures. The modelling of electron trajectories near

  10. A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

    Science.gov (United States)

    Loch, D. A. L.; Ehiasarian, A. P.

    2012-09-01

    Sputtering magnetic materials with magnetron based systems has the disadvantage of field quenching and variation of alloy composition with target erosion. The advantage of eliminating magnetic fields in the chamber is that this enables sputtered particles to move along the electric field more uniformly. Inductively coupled impulse sputtering (ICIS) is a form of high power impulse magnetron sputtering (HIPIMS) without a magnetic field where a high density plasma is produced by a high power radio frequency (RF) coil in order to sputter the target and ionise the metal vapour. In this emerging technology, the effects of power and pressure on the ionisation and deposition process are not known. The setup comprises of a 13.56 MHz pulsed RF coil pulsed with a duty cycle of 25 %. A pulsed DC voltage of 1900 V was applied to the cathode to attract Argon ions and initiate sputtering. Optical emission spectra (OES) for Cu and Ti neutrals and ions at constant pressure show a linear intensity increase for peak RF powers of 500 W - 3400 W and a steep drop of intensity for a power of 4500 W. Argon neutrals show a linear increase for powers of 500 W - 2300 W and a saturation of intensity between 2300 W - 4500 W. The influence of pressure on the process was studied at a constant peak RF power of 2300 W. With increasing pressure the ionisation degree increased. The microstructure of the coatings shows globular growth at 2.95×10-2 mbar and large-grain columnar growth at 1.2×10-1 mbar. Bottom coverage of unbiased vias with a width of 0.360 μm and aspect ratio of 2.5:1 increased from 15 % to 20 % for this pressure range. The current work has shown that the concept of combining a RF powered coil with a magnet-free high voltage pulsed DC powered cathode is feasible and produces very stable plasma. The experiments have shown a significant influence of power and pressure on the plasma and coating microstructure.

  11. Sputtering Yield Calculation of Some Candidate PFC Materials

    Institute of Scientific and Technical Information of China (English)

    DENGBaiquan; YANJiancheng; HUANGJinhua

    2001-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and Li bombarded by charged particles H+, D+, T+ and He+ are calculated by application of sputtering theory based on bipartition model of ion transport. The comparisons with Monte-Carlo calculation results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyze the impurity level in core plasma of fusion reactors.

  12. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  13. Comparison of induced damage, range, reflection, and sputtering yield between amorphous, bcc crystalline, and bubble-containing tungsten materials under hydrogen isotope and noble gas plasma irradiations

    Science.gov (United States)

    Saito, Seiki; Nakamura, Hiroaki; Tokitani, Masayuki

    2017-01-01

    Binary-collision-approximation simulation of hydrogen isotope (i.e., hydrogen, deuterium, and tritium) and noble gas (i.e., helium, neon, and argon) injections into tungsten materials is performed. Three tungsten structures (i.e., amorphous, bcc crystalline, and helium bubble-containing structures) are prepared as target materials. Then, the trajectories of incident atoms, the distribution of recoil atoms, the penetration depth range of incident atoms, the sputtering yield, and the reflection rate are carefully investigated for these target materials.

  14. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  15. Denton Vacuum Discovery-550 Sputterer

    Data.gov (United States)

    Federal Laboratory Consortium — Description: CORAL Name: Sputter 2 Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements: Specifications / Capabilities:...

  16. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  17. Sputtering of dimers off a silicon surface

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Kopnarski, Michael [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Institut fuer Oberflaechen- und Schichtanalytik IFOS GmbH, Trippstadter Strasse 120, D-67663 Kaiserslautern (Germany); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany)

    2012-10-15

    We present experimental and molecular-dynamics simulation results of the sputtering of a Si surface by 2 keV Ar ions. Results on both the monomer and dimer distributions are presented. In simulation, these distributions follow a generalized Thompson law with power exponent n=2 and n=3, respectively. The experimental data, obtained via plasma post-ionization in an SNMS (secondary neutral mass spectrometry) apparatus, show good agreement with respect to the dimer fraction, and the relative energy distributions of dimers and monomers. The consequences for the dimer sputtering mechanism are discussed.

  18. Influence of plasma-generated negative oxygen ion impingement on magnetron sputtered amorphous SiO{sub 2} thin films during growth at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Macias-Montero, M.; Garcia-Garcia, F. J.; Alvarez, R.; Gil-Rostra, J.; Gonzalez, J. C.; Gonzalez-Elipe, A. R.; Palmero, A. [Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Americo Vespucio 49, 41092 Seville (Spain); Cotrino, J. [Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Americo Vespucio 49, 41092 Seville (Spain); Departamento de Fisica Atomica, Molecular y Nuclear, Universidad de Sevilla, Avda. Reina Mercedes, s/n, 42022 Seville (Spain)

    2012-03-01

    Growth of amorphous SiO{sub 2} thin films deposited by reactive magnetron sputtering at low temperatures has been studied under different oxygen partial pressure conditions. Film microstructures varied from coalescent vertical column-like to homogeneous compact microstructures, possessing all similar refractive indexes. A discussion on the process responsible for the different microstructures is carried out focusing on the influence of (i) the surface shadowing mechanism, (ii) the positive ion impingement on the film, and (iii) the negative ion impingement. We conclude that only the trend followed by the latter and, in particular, the impingement of O{sup -} ions with kinetic energies between 20 and 200 eV, agrees with the resulting microstructural changes. Overall, it is also demonstrated that there are two main microstructuring regimes in the growth of amorphous SiO{sub 2} thin films by magnetron sputtering at low temperatures, controlled by the amount of O{sub 2} in the deposition reactor, which stem from the competition between surface shadowing and ion-induced adatom surface mobility.

  19. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  20. Dynamic Monte Carlo simulation for reactive sputtering of aluminium

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Z.Y. E-mail: chen@uia.ua.ac.be; Bogaerts, A.; Depla, D.; Ignatova, V

    2003-08-01

    We have applied TRIDYN to simulate the transition from the metallic sputtering to the reactive sputtering mode during magnetron sputtering for an Al target when oxygen is added to argon plasma. Changes in the thickness and composition of multicomponent targets are investigated. The results basically confirm the reactive ion implantation mechanism together with chemical reaction in the subsurface. When oxygen mole fraction x<0.14, the target surface never becomes fully oxidized, even for very long sputtering times. When x>0.14 the target surface can be more or less fully oxidized. Furthermore, an abrupt change in the surface erosion rate at x=0.03 is observed. This corresponds to the avalanche phenomenon indicating the sputtering mode transition.

  1. Design of a Plasma Emission Monitoring System Used in a Reactive Sputtering Coating%反应溅射镀膜的等离子体发射控制系统设计

    Institute of Scientific and Technical Information of China (English)

    肖劲宇; 和军平

    2011-01-01

    A Plasma Emission Monitoring (PEM) control system based on Allen -Bradley PLC Controller is designed by means of PID algorithm in this paper. Sputter coating principle is introduced firstly and its disanvantage is analyzed too. Then a PEM control technology is proposed to improve sputter coating performance. Besides discussing the sensor, actuator and controller. PID control program in PLC is introduced. A prototype is built up and it works normally. In the end, several process related elements that affect the accuracy, the stability of PEM control loop are also mentioned.%介绍了一种基于Allen- Bradley可编程控制器的等离子体发射监控闭环控制系统;在介绍溅射镀膜工作原理的基础上,分析了影响镀膜性能的多个因素,提出了等离子体发射监控反应溅射镀膜的控制方案;进而,具体介绍了等离子体发射监控系统的传感器、执行器的结构与设计,并进行了PLC- PID控制软件的编程,实现了快速、稳定的控制功能,使反应溅射镀膜工作均匀;实际运行证明了本等离子发射监控设计合理性,可制备氮化钛、氧化钛化合物薄膜,具有良好的推广价值.

  2. Fundamental sputtering studies: Nonresonant ionization of sputtered neutrals

    Energy Technology Data Exchange (ETDEWEB)

    Burnett, J.W.; Pellin, M.J.; Calaway, W.F.; Gruen, D.M. (Argonne National Lab., IL (United States)); Yates, J.T. Jr. (Pittsburgh Univ., PA (United States). Dept. of Chemistry)

    1989-01-04

    Because of the practical importance of sputtering, numerous theories and computer simulations are used for predicting many aspects of the sputtering process. Unfortunately, many of the calculated sputtering results are untested by experiment. Until recently, most sputtering experiments required either very high ion fluences or the detection of only minor constituents of the sputtered flux, i.e., ions. These techniques may miss the subtleties involved in the sputtering process. High-detection-efficiency mass spectrometry, coupled with the laser ionization of neutral atoms, allows the detection of the major sputtered species with very low incident ion fluences. The depth-of-origin of sputtered atoms is one example of an important but poorly understood aspect of the sputtering process. By following the sputtering yield of a substrate atom with various coverages of an adsorbed overlayer, the depth of origin of sputtered atoms has been determined. Our results indicate that two-thirds of the sputtered flux originates in the topmost atomic layer. The ion-dose dependence of sputtering yields has long been assumed to be quite minor for low- to-moderate primary ion fluences. We have observed a two-fold decrease in the sputtering yield of the Ru(0001) surface for very low primary ion fluences. Data analysis results in a cross section for damage of 2.7 {plus minus} 1.0 {times} 10{sup {minus}15}cm{sup 2}. 40 refs., 3 figs., 2 tabs.

  3. Observations and diagnostics in high brightness beams

    Energy Technology Data Exchange (ETDEWEB)

    Cianchi, A., E-mail: alessandro.cianchi@roma2.infn.it [University of Rome Tor Vergata and INFN-Roma Tor Vergata, Via della Ricerca Scientifica 1, 00133 Rome (Italy); Anania, M.P.; Bisesto, F.; Castellano, M.; Chiadroni, E.; Pompili, R.; Shpakov, V. [INFN-LNF, Via Enrico Fermi 40, 00044 Frascati (Italy)

    2016-09-01

    The brightness is a figure of merit largely used in the light sources, like FEL (Free Electron Lasers), but it is also fundamental in several other applications, as for instance Compton backscattering sources, beam driven plasma accelerators and THz sources. Advanced diagnostics are essential tools in the development of high brightness beams. 6D electron beam diagnostics will be reviewed with emphasis on emittance measurement.

  4. RF Sputtering for preparing substantially pure amorphous silicon monohydride

    Science.gov (United States)

    Jeffrey, Frank R.; Shanks, Howard R.

    1982-10-12

    A process for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicon produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous silicon hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  5. New Description Model of Sputtering on Material Surface

    Institute of Scientific and Technical Information of China (English)

    邓柏权; 严建成; 黄锦华; 彭利林

    2003-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and deuterium-saturated Li bombarded by fusion charged particles are calculated by application of new sputtering physics description methods based on the bipartition model of ion transport theory. The comparisons with Monte Carlo calculation and experimental results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyse the impurity level in core plasma of fusion reactors.

  6. Alamethicin permeabilizes the plasma membrane and mitochondria but not the tonoplast in tobacco (Nicotiana tabacum L. cv Bright Yellow) suspension cells

    DEFF Research Database (Denmark)

    Matic, S.; Geisler, D.A.; Møller, I.M.

    2005-01-01

    The ion channel-forming peptide AlaM (alamethicin) is known to permeabilize isolated mitochondria as well as animal cells. When intact tobacco (Nicotiana tabacum L.) Bright Yellow-2 cells were treated with AlaM, the cells became permeable for low-molecular-mass molecules as shown by induced leakage...... the H2O2 necessary for NADH oxidation by apoplastic peroxidases, mitochondrial oxygen consumption could be measured in permeabilized cells. Inhibitor-sensitive oxidation of the respiratory substrates succinate, malate and NADH was observed after the addition of the appropriate coenzymes (ATP, NAD...

  7. Surface treatment of diamond-like carbon films by reactive Ar/CF{sub 4} high-power pulsed magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Kimura, Takashi, E-mail: t-kimura@nitech.ac.jp [Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Nishimura, Ryotaro [Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan); Azuma, Kingo [Department of Electrical Engineering and Computer Sciences, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280 (Japan); Nakao, Setsuo; Sonoda, Tsutomu; Kusumori, Takeshi; Ozaki, Kimihiro [National Institute of Advanced Industrial Science and Technology (AIST) - Chubu, 2266-98 Anagahora, Moriyama, Nagoya 463-8560 (Japan)

    2015-12-15

    Surface modification of diamond-like carbon films deposited by a high-power pulsed magnetron sputtering (HPPMS) of Ar was carried out by a HPPMS of Ar/CF{sub 4} mixture, changing a CF{sub 4} fraction from 2.5% to 20%. The hardness of the modified films markedly decreased from about 13 to about 3.5 GPa with increasing CF{sub 4} fraction, whereas the water contact angle of the modified films increased from 68° to 109° owing to the increase in the CF{sub x} content on the film surface. C 1s spectra in X-ray photoelectron spectroscopy indicated that a graphitic structure of modified films was formed at CF{sub 4} fractions less than 5%, above which the modified films possessed a polymer-like structure. Influence of treatment time on the properties of the modified films was also investigated in the range of treatment time from 5 to 30 min. The properties of the modified films did not depend on the treatment time in the range of treatment time longer than 10 min, whereas the water contact angle was not sensitive to the treatment time at any treatment time.

  8. Comparative study of structural and electro-optical properties of ZnO:Ga films grown by steered cathodic arc plasma evaporation and sputtering on plastic and their application on polymer-based organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Chih-Hao, E-mail: dataman888@hotmail.com [R& D Division, Walsin Technology Corporation, Kaohsiung, Taiwan (China); Hsiao, Yu-Jen [National Nano Device Laboratories, National Applied Research Laboratories, Tainan, Taiwan (China); Hwang, Weng-Sing [Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan (China)

    2016-08-01

    Ga-doped ZnO (GZO) films with various thicknesses (105–490 nm) were deposited on PET substrates at a low temperature of 90 °C by a steered cathodic arc plasma evaporation (steered CAPE), and a GZO film with a thickness of 400 nm was deposited at 90 °C by a magnetron sputtering (MS) for comparison. The comparative analysis of the microstructure, residual stress, surface morphology, electrical and optical properties, chemical states, and doping efficiency of the films produced by the steered CAPE and MS processes was performed, and the effect of thickness on the CAPE-grown GZO films was investigated in detail. The results showed that the GZO films grown by steered CAPE exhibited higher crystallinity and lower internal stress than those deposited by MS. The transmittance and electrical properties were also enhanced for the steered CAPE-grown films. The figure of merit (Φ = T{sup 10}/R{sub s}, where T is the transmittance and R{sub s} is the sheet resistance in Ω/□). was used to evaluate the performance of the electro-optical properties. The GZO films with a thickness of 400 nm deposited by CAPE had the highest Φ value, 1.94 × 10{sup −2} Ω{sup −1}, a corresponding average visible transmittance of 88.8% and resistivity of 6.29 × 10{sup −4} Ω·cm. In contrast, the Φ value of MS-deposited GZO film with a thickness of 400 nm is only 1.1 × 10{sup −3} Ω{sup −1}. This can be attributed to the increase in crystalline size, [0001] preferred orientation, decrease in stacking faults density and Ar contamination in steered CAPE-grown films, leading to increases in the Hall mobility and carrier density. In addition, the power conversion efficiency (PCE) of organic solar cells was significantly improved by using the CAPE-grown GZO electrode, and the PCE values were 1.2% and 1.7% for the devices with MS-grown and CAPE-grown GZO electrodes, respectively. - Highlights: • ZnO:Ga (GZO) films were grown on PET by steered cathodic arc plasma evaporation (CAPE

  9. Compression and strong rarefaction in high power impulse magnetron sputtering discharges

    Energy Technology Data Exchange (ETDEWEB)

    Horwat, David; Anders, Andre

    2010-11-11

    Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.

  10. Burkina Faso - BRIGHT II

    Data.gov (United States)

    Millennium Challenge Corporation — Millennium Challenge Corporation hired Mathematica Policy Research to conduct an independent evaluation of the BRIGHT II program. The three main research questions...

  11. Properties of inductively coupled N2 plasma processed AlInN thin film prepared by post annealing of rf sputtered Al/InN stack

    Science.gov (United States)

    Shanmugan, S.; Mutharasu, D.

    2016-12-01

    InN is a potential material for low cost tandem solar cells and its combination with Si could make the cell conversion efficiency over 30%. Doping into InN is a promising method which alters the properties of InN thin film. In this work, InN thin film was deposited on Si substrate and the doping was achieved by stacking Al elemental layer on InN thin film followed by annealing process. The doped InN (AlInN) thin film was characterized and confirmed the formation of (002) and (103) oriented phases. The prepared AlInN thin film was plasma processed using Inductively coupled plasma (ICP) in presence of N2 gas and the surface and structural properties was modified. The N2 plasma was influenced the preferred orientation of AlInN thin film and their structural parameters such as crystallite size, strain and dislocation density noticeably. Very smooth surface (<4 nm) with small particle size (97 nm) of AlInN thin film was achieved for 15 sccm flow rate during the plasma process. Very low value in leakage current was confirmed for AlInN thin film processed at 15 sccm N2 flow by current-voltage (IV) characteristics.

  12. Anion formation in sputter ion sources by neutral resonant ionization

    Energy Technology Data Exchange (ETDEWEB)

    Vogel, J. S., E-mail: johnsvogel@yahoo.com [University of California, 8300 Feliz Creek Dr., Ukiah, California 95482 (United States)

    2016-02-15

    Focused Cs{sup +} beams in sputter ion sources create mm-diameter pits supporting small plasmas that control anionization efficiencies. Sputtering produces overwhelmingly neutral products that the plasma can ionize as in a charge-change vapor. Electron capture between neutral atoms rises as the inverse square of the difference between the ionization potential of the Cs state and the electron affinity of the sputtered atom, allowing resonant ionization at very low energies. A plasma collision-radiation model followed electronic excitation up to Cs(7d). High modeled Cs(7d) in a 0.5 mm recess explains the 80 μA/mm{sup 2} C{sup −} current density compared to the 20 μA/mm{sup 2} from a 1 mm recess.

  13. Three-dimensional particle simulation of back-sputtered carbon in electric propulsion test facility

    Science.gov (United States)

    Zheng, Hongru; Cai, Guobiao; Liu, Lihui; Shang, Shengfei; He, Bijiao

    2017-03-01

    The back-sputtering deposition on thruster surface caused by ion bombardment on chamber wall material affects the performance of thrusters during the ground based electric propulsion endurance tests. In order to decrease the back-sputtering deposition, most of vacuum chambers applied in electric propulsion experiments are equipped with anti-sputtering targets. In this paper, a three-dimensional model of plume experimental system (PES) including double layer anti-sputtering target is established. Simulation cases are made to simulate the plasma environment and sputtering effects when an ion thruster is working. The particle in cell (PIC) method and direct simulation Monte Carlo (DSMC) method is used to calculate the velocity and position of particles. Yamamura's model is used to simulate the sputtering process. The distribution of sputtered anti-sputtering target material is presented. The results show that the double layer anti-sputtering target can significantly reduce the deposition on thruster surface. The back-sputtering deposition rates on thruster exit surface for different cases are compared. The chevrons on the secondary target are rearranged to improve its performance. The position of secondary target has relation with the ion beam divergence angle, and the radius of the vacuum chamber. The back-sputtering deposition rate is lower when the secondary target covers the entire ion beam.

  14. Discharge current modes of high power impulse magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Zhongzhen Wu

    2015-09-01

    Full Text Available Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

  15. Magnet-free uniform sputtering of dielectric film by RF and microwave power superposition

    Science.gov (United States)

    Sasai, Kensuke; Hagihara, Toshiya; Noda, Tomonori; Suzuki, Haruka; Toyoda, Hirotaka

    2016-08-01

    A novel sputtering device that is free of magnets (magnet-free surface wave sputtering plasma: MF-SSP) is developed by combining a surface wave plasma and RF bias power. Low-pressure (<0.5 Pa) plasma sustainment is demonstrated by MF-SSP with a uniform sputter deposition rate with a deviation of less than 5% within an area of 10 × 10 cm2. Highly oriented MgO films are deposited at a substrate temperature of 200 °C.

  16. Sunspot Bright Points

    CERN Document Server

    Choudhary, Debi Prasad

    2010-01-01

    We used the flux calibrated images through the Broad Band Filter Imager and Stokes Polarimeter data obtained with the Solar Optical Telescope onboard the Hinode spacecraft to study the properties of bright points in and around the sunspots. The well isolated bright points were selected and classified as umbral dot, peripheral umbral dot, penumbral grains and G-band bright point depending on their location. Most of the bright points are smaller than about 150 km. The larger points are mostly associated with the penumbral features. The bright points are not uniformly distributed over the umbra but preferentially located around the penumbral boundary and in the fast decaying parts of umbra. The color temperature of the bright points, derived using the continuum irradiance, are in the range of 4600 K to 6600 K with cooler ones located in the umbra. The temperature increases as a function of distance from the center to outside. The G-band, CN-band and CaII H flux of the bright points as a function of their blue ba...

  17. Magnetron sputtering system stabilisation for high rate desposition of AlN films

    DEFF Research Database (Denmark)

    Fomin, A; Akhmatov, Vladislav; Selishchev, S

    1998-01-01

    The stabilisation of a planar magnetron sputtering system for reactive sputtering of AlN in a gaseous mixture of Ar and highly active NH3 was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition of c...

  18. [Bright light therapy].

    Science.gov (United States)

    Poirrier, R; Cambron, L

    2007-01-01

    Bright light therapy is a treatment that emerged in the eighties of the last century. It can be used in different pathologies such as seasonal affective disorders, major depressions, and many disorders of the wake-sleep rhythm, whether they are of primary or secondary origin. Important progress made at the basic neuroscience levels, allows today a sound understanding of the bright light mode of action. Moreover, the main indications are now the subject of consensus reports and meta-analyses which show good levels of evidence-based medicine. Bright light therapy constitutes a first choice indication in seasonal affective disorder. It is also perfectly possible to prescribe bright light therapy in the major depression disorders. It has been demonstrated that the effect size is the same as with antidepressants of reference. It is admitted nowadays that bright light therapy may be at least, an adjunct to pharmacotherapy, in order to accelerate the antidepressant effect onset, or to prolong this effect after withdrawal of the drug. Bright light therapy can also be viewed as an alternative to the pharmacological approach especially when this one is impossible, not tolerated or not accepted by the patient. The contraindications are rare.

  19. Sputtering of W-Mo alloy under ion bombardment

    Institute of Scientific and Technical Information of China (English)

    1999-01-01

    The distribution of plasma density in the vicinity of the W-Mo alloy source in the process of dou ble-glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W-Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W-Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70 % ~ 75 % Mo, 22 % ~ 25 % W; there appears segregation on the surface of the W-Mo alloy source.

  20. Sputtering by the Solar Wind: Effects of Variable Composition

    Science.gov (United States)

    Killen, R. M.; Arrell, W. M.; Sarantos, M.; Delory, G. T.

    2011-01-01

    It has long been recognized that solar wind bombardment onto exposed surfaces in the solar system will produce an energetic component to the exospheres about those bodies. Laboratory experiments have shown that there is no increase in the sputtering yield caused by highly charged heavy ions for metallic and for semiconducting surfaces, but the sputter yield can be noticeably increased in the case of a good insulating surface. Recently measurements of the solar wind composition have become available. It is now known that the solar wind composition is highly dependent on the origin of the particular plasma. Using the measured composition of the slow wind, fast wind, solar energetic particle (SEP) population, and coronal mass ejection (CME), broken down into its various components, we have estimated the total sputter yield for each type of solar wind. Whereas many previous calculations of sputtering were limited to the effects of proton bombardment. we show that the heavy ion component. especially the He++ component. can greatly enhance the total sputter yield during times when the heavy ion population is enhanced. We will discuss sputtering of both neutrals and ions.

  1. Kinetic simulation of neutral particle transport in sputtering processes

    Science.gov (United States)

    Trieschmann, Jan; Gallian, Sara; Brinkmann, Ralf Peter; Mussenbrock, Thomas; Ries, Stefan; Bibinov, Nikita; Awakowicz, Peter

    2013-09-01

    For many physical vapor deposition applications using sputtering processes, knowledge about the detailed spatial and temporal evolution of the involved gas species is of great importance. Modeling of the involved gas dynamic and plasma processes is however challenging, because the operating pressure is typically below 1 Pa. In consequence, only kinetic descriptions are appropriate. In order to approach this problem, the dynamics of sputtered particle transport through a neutral gas background is simulated. For this study, a modified version of the three-dimensional Direct Simulation Monte Carlo (DSMC) code dsmcFoam is utilized. The impact of a transient sputtering wind is investigated in a generic reactor geometry, which may be used for dc Magnetron Sputtering (dcMS), High Power Impulse Magnetron Sputtering (HiPIMS), as well as sputtering in capacitively coupled discharges. In the present work a rarefaction of the background gas is observed. Moreover in pulsed mode the temporal dynamics of the rarefaction and subsequent recovery of the background gas is investigated. This work is supported by the German Research Foundation in the frame of TRR 87.

  2. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  3. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, w

  4. Estimation of the Efficiency of Material Injection into the Reflex Discharge by Sputtering the Cathode Material

    CERN Document Server

    Kovtun, Yu V; Skibenko, A I; Yuferov, V B

    2012-01-01

    The processes of injection of a sputtered-and-ionized working material into the pulsed reflex discharge plasma have been considered at the initial stage of dense gas-metal plasma formation. A calculation model has been proposed to estimate the parameters of the sputtering mechanism for the required working material to be injected into the discharge. The data obtained are in good accordance with experimental results.

  5. Development of magnetron sputtering simulator with GPU parallel computing

    Science.gov (United States)

    Sohn, Ilyoup; Kim, Jihun; Bae, Junkyeong; Lee, Jinpil

    2014-12-01

    Sputtering devices are widely used in the semiconductor and display panel manufacturing process. Currently, a number of surface treatment applications using magnetron sputtering techniques are being used to improve the efficiency of the sputtering process, through the installation of magnets outside the vacuum chamber. Within the internal space of the low pressure chamber, plasma generated from the combination of a rarefied gas and an electric field is influenced interactively. Since the quality of the sputtering and deposition rate on the substrate is strongly dependent on the multi-physical phenomena of the plasma regime, numerical simulations using PIC-MCC (Particle In Cell, Monte Carlo Collision) should be employed to develop an efficient sputtering device. In this paper, the development of a magnetron sputtering simulator based on the PIC-MCC method and the associated numerical techniques are discussed. To solve the electric field equations in the 2-D Cartesian domain, a Poisson equation solver based on the FDM (Finite Differencing Method) is developed and coupled with the Monte Carlo Collision method to simulate the motion of gas particles influenced by an electric field. The magnetic field created from the permanent magnet installed outside the vacuum chamber is also numerically calculated using Biot-Savart's Law. All numerical methods employed in the present PIC code are validated by comparison with analytical and well-known commercial engineering software results, with all of the results showing good agreement. Finally, the developed PIC-MCC code is parallelized to be suitable for general purpose computing on graphics processing unit (GPGPU) acceleration, so as to reduce the large computation time which is generally required for particle simulations. The efficiency and accuracy of the GPGPU parallelized magnetron sputtering simulator are examined by comparison with the calculated results and computation times from the original serial code. It is found that

  6. Measurements and Modelling of Sputtering Rates with Low Energy Ions

    Science.gov (United States)

    Ruzic, David N.; Smith, Preston C.; Turkot, Robert B., Jr.

    1996-10-01

    The angular-resolved sputtering yield of Be by D+, and Al by Ar+ was predicted and then measured. A 50 to 1000 eV ion beam from a Colutron was focused on to commercial grade and magnetron target grade samples. The S-65 C grade beryllium samples were supplied by Brush Wellman and the Al samples from TOSOH SMD. In our vacuum chamber the samples can be exposed to a dc D or Ar plasma to remove oxide, load the surface and more-nearly simulate steady state operating conditions in the plasma device. The angular distribution of the sputtered atoms was measured by collection on a single crystal graphite witness plate. The areal density of Be or Al (and BeO2 or Al2O3, after exposure to air) was then measured using a Scanning Auger Spectrometer. Total yield was also measured by deposition onto a quartz crystal oscillator simultaneously to deposition onto the witness plate. A three dimensional version of vectorized fractal TRIM (VFTRIM3D), a Monte-Carlo computer code which includes surface roughness characterized by fractal geometry, was used to predict the angular distribution of the sputtered particles and a global sputtering coefficient. Over a million trajectories were simulated for each incident angle to determine the azimuthal and polar angle distributions of the sputtered atoms. The experimental results match closely with the simulations for total yield, while the measured angular distributions depart somewhat from the predicted cosine curve.

  7. Smoothing of Discharge Inhomogeneities at High Currents in Gasless High Power Impulse Magnetron Sputtering

    CERN Document Server

    Andersson, Joakim; Anders, André

    2014-01-01

    The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are implicated in generation of the high ion kinetic energies observed in HiPIMS. We show that the inhomogeneities smooth out at high discharge current to yield azimuthally homogeneous plasma. This may have implications for the spatial and kinetic energy distribution of sputtered particles, and therefore also on the thin films deposited by high power impulse magnetron sputtering.

  8. Sputtering in supported cluster arrays

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física Aplicada a la Ingeniería Aeronáutica y Naval, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III, Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2015-06-01

    Bombardment of periodical arrays formed by Co nanoislands deposited on a Cu(0 0 1) substrate with 1-keV argon ions is simulated by using molecular dynamics. Sputtering yield is analyzed distinguishing between particles sputtered across the supported cluster surface and across the flat substrate surface without nanoparticle above. The dependence of this magnitude on the height and the periodical spacing between nanoislands has been investigated. Results show that this dependence for the sputtering across the nanoislands and across the substrate is different. In the case of the total sputtering, the “substrate” effect prevails since the behavior of this magnitude is approximately analogous to the sputtering across the substrate. The more probable causes are analyzed in this article.

  9. Hollow metal target magnetron sputter type radio frequency ion source

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, N., E-mail: mwada@mail.doshisha.ac.jp; Kasuya, T.; Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan); Tsubouchi, N. [Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)

    2014-02-15

    A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu{sup +} has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu{sup +} had occupied more than 85% of the total ion current. Further increase in Cu{sup +} ions in the beam is anticipated by increasing the RF power and Ar pressure.

  10. The brightness of colour.

    Directory of Open Access Journals (Sweden)

    David Corney

    Full Text Available BACKGROUND: The perception of brightness depends on spatial context: the same stimulus can appear light or dark depending on what surrounds it. A less well-known but equally important contextual phenomenon is that the colour of a stimulus can also alter its brightness. Specifically, stimuli that are more saturated (i.e. purer in colour appear brighter than stimuli that are less saturated at the same luminance. Similarly, stimuli that are red or blue appear brighter than equiluminant yellow and green stimuli. This non-linear relationship between stimulus intensity and brightness, called the Helmholtz-Kohlrausch (HK effect, was first described in the nineteenth century but has never been explained. Here, we take advantage of the relative simplicity of this 'illusion' to explain it and contextual effects more generally, by using a simple Bayesian ideal observer model of the human visual ecology. We also use fMRI brain scans to identify the neural correlates of brightness without changing the spatial context of the stimulus, which has complicated the interpretation of related fMRI studies. RESULTS: Rather than modelling human vision directly, we use a Bayesian ideal observer to model human visual ecology. We show that the HK effect is a result of encoding the non-linear statistical relationship between retinal images and natural scenes that would have been experienced by the human visual system in the past. We further show that the complexity of this relationship is due to the response functions of the cone photoreceptors, which themselves are thought to represent an efficient solution to encoding the statistics of images. Finally, we show that the locus of the response to the relationship between images and scenes lies in the primary visual cortex (V1, if not earlier in the visual system, since the brightness of colours (as opposed to their luminance accords with activity in V1 as measured with fMRI. CONCLUSIONS: The data suggest that perceptions

  11. Review of strategies for a comprehensive simulation in sputtering devices

    CERN Document Server

    Gentile, Antonio A

    2012-01-01

    The development of sputtering facilities, at the moment, is mainly pursued through experimental tests, or simply by expertise in the field, and relies much less on numerical simulation of the process environment. This leads to great efforts and empirically, roughly optimized solutions: in fact, the simulation of these devices, at the state of art, is quite good in predicting the behavior of single steps of the overall deposition process, but it seems still ahead a full integration among the tools simulating the various phenomena involved in a sputter. We summarize here the techniques and codes already available for problems of interest in sputtering facilities, and we try to outline the possible features of a comprehensive simulation framework. This framework should be able to integrate the single paradigms, dealing with aspects going from the plasma environment up to the distribution and properties of the deposited film, not only on the surface of the substrate, but also on the walls of the process chamber.

  12. CA BrightStor

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    CA推出的BrightStor系列存储管理解决方案已经成为企业电子商务体系架构管理战略中举足轻重的组成部分。BrightStor是一整套企业级的智能化存储管理解决方案,定位在存储硬件设备和上层应用之间,通过各种集成化的产品和工具为驻留在企业任何位置的数据提供全方位的、有效的存储管理和保护。

  13. Bright Economic Prospects

    Institute of Scientific and Technical Information of China (English)

    Zhang Minqiu

    2004-01-01

    @@ India is expected to register an 8.2% growth rate for the 2003-04 fiscal year. The overall economic situation this year has been satisfactory despite the scaled down 6-6.5% growth rate for the new fiscal year due to oil price hikes, reduced monsoon volume and some 7% inflation. Judging from the following factors, bright prospects are in store for the country down the road.

  14. Reactive high power impulse magnetron sputtering: combining simulation and experiment

    Science.gov (United States)

    Kozak, Tomas; Vlcek, Jaroslav

    2016-09-01

    Reactive high-power impulse magnetron sputtering (HiPIMS) has recently been used for preparation of various oxide films with high application potential, such as TiO2, ZrO2, Ta2O5, HfO2, VO2. Using our patented method of pulsed reactive gas flow control with an optimized reactive gas inlet, we achieved significantly higher deposition rates compared to typical continuous dc magnetron depositions. We have developed a time-dependent model of the reactive HiPIMS. The model includes a depth-resolved description of the sputtered target (featuring sputtering, implantation and knock-on implantation processes) and a parametric description of the discharge plasma (dissociation of reactive gas, ionization and return of sputtered atoms and gas rarefaction). The model uses a combination of experimental and simulation data as input. We have calculated the composition of the target and substrate for several deposition conditions. The simulations predict a reduced compound coverage of the target in HiPIMS compared to the continuous dc sputtering regime which explains the increased deposition rate. The simulations show that an increased dissociation of oxygen in a HiPIMS discharge is beneficial to achieve stoichiometric films on the substrate at high deposition rates.

  15. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  16. Low surface brightness galaxies

    Science.gov (United States)

    Vanderhulst, J. M.; Deblok, W. J. G.; Mcgaugh, S. S.; Bothun, G. D.

    1993-01-01

    A program to investigate the properties of low surface brightness (LSB) galaxies involving surface photometry in U, B, V, R, I, and H-alpha, HI imaging with the Westerbork Synthesis Radio Telescope (WSRT) and the very large array (VLA) and spectrophotometry of H2 regions in LSB galaxies is underway. The goal is to verify the idea that LSB galaxies have low star formation rates because the local gas density falls below the critical density for star formation, and to study the stellar population and abundances in LSB galaxies. Such information should help understanding the evolutionary history of LSB galaxies. Some preliminary results are reported.

  17. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  18. Using the Multipole Resonance Probe to Stabilize the Electron Density During a Reactive Sputter Process

    Science.gov (United States)

    Oberberg, Moritz; Styrnoll, Tim; Ries, Stefan; Bienholz, Stefan; Awakowicz, Peter

    2015-09-01

    Reactive sputter processes are used for the deposition of hard, wear-resistant and non-corrosive ceramic layers such as aluminum oxide (Al2O3) . A well known problem is target poisoning at high reactive gas flows, which results from the reaction of the reactive gas with the metal target. Consequently, the sputter rate decreases and secondary electron emission increases. Both parameters show a non-linear hysteresis behavior as a function of the reactive gas flow and this leads to process instabilities. This work presents a new control method of Al2O3 deposition in a multiple frequency CCP (MFCCP) based on plasma parameters. Until today, process controls use parameters such as spectral line intensities of sputtered metal as an indicator for the sputter rate. A coupling between plasma and substrate is not considered. The control system in this work uses a new plasma diagnostic method: The multipole resonance probe (MRP) measures plasma parameters such as electron density by analyzing a typical resonance frequency of the system response. This concept combines target processes and plasma effects and directly controls the sputter source instead of the resulting target parameters.

  19. Sputtering and codeposition of silicon carbide with deuterium

    Science.gov (United States)

    Causey, Rion A.

    2003-03-01

    Due to its excellent thermal properties, silicon carbide is being considered as a possible plasma-facing material for fusion devices. If used as a plasma-facing material, the energetic hydrogen isotope ions and charge-exchanged neutrals escaping from the plasma will sputter the silicon carbide. To assess the tritium inventory problems that will be generated by the use of this material, it is necessary that we know the codeposition properties of the redeposited silicon carbide. To determine the codeposition properties, the deuterium plasma experiment at Sandia National Laboratories in Livermore, California has been used to directly compare the deuterium sputtering and codeposition of silicon carbide with that of graphite. A Penning discharge at a flux of 6×10 19 D/m 2 and an energy of ≈300 eV was used to sputter silicon and carbon from a pair of 0.05 m diameter silicon carbide disks. The removal rate of deuterium gas from the fixed volume of the system isolated from all other sources and sinks was used to measure the codeposition probability (probability that a hydrogen isotope atom will be removed through codeposition per ion striking the sample surface). A small catcher plate used to capture a fraction of the codeposited film was analyzed using Auger spectroscopy. This analysis showed the film to begin with a high carbon to silicon ratio due to preferential sputtering of the carbon. As the film became thicker, the ratio of the depositing material changed over to the (1:1) value that must eventually be attained.

  20. Ionized magnetron sputtering of aluminum(,2)oxygen(,3)

    Science.gov (United States)

    Gonzalez, Patrick Fernando

    2000-10-01

    This dissertation shows a detailed study of the conditions necessary for sputtering alumina using a novel variant of ionized magnetron sputtering (IMS) first demonstrated by Yamashita et. al. The study presented herein leverages concurrent research at our laboratory on high density plasmas, plasma characterization and charged particle beams research to demonstrate a new source capable of sputtering hydrated alumina films at high rates. High quality ceramics such as Al2O3 find uses in a variety of applications, and in particular, for mass storage applications. Consequently, there exists an ever-growing need to provide and improve the capability of growing thick insulating films. Ideally, the insulating film should be stoichiometric and able to be grown at rates high enough to be easily manufacturable. Alumina is a particularly attractive due to its high density, Na barrier properties, and stability and radiation resistance. However, high quality films are often difficult to achieve with conventional RF plasma due to extremely slow deposition rates and difficulties associated with system cooling. The preferred method is to reactively sputter Al from a solid target in an O2 ambient. Nevertheless, this process is inherently unstable and leads to arcing and uneven target wear when magnetrons are used. In this study, we build the sputtering source, evaluate, and maximize the deposition characteristics of alumina films sputtered from a solid target in an Ar/O2 ambient. Semi-crystalline (kappa + theta) alumina has been reported using a similar technique at temperatures as low 370 C. The difference in the system used herein is that RF power is used for both, the inductive and capacitive components. Additionally, we use a solid target made of sintered alumina throughout the experiment. A model is developed using regression analysis and compared to results obtained. Because plasma parameters can interact with each other, we explore ICP/CCP power interactions and gas influence

  1. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Lorinčík, Jan [Faculty of Science, J. E. Purkinje University, České mládeže 8, 400 96 Ústí nad Labem (Czech Republic); Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberská 57, 182 51 Praha (Czech Republic); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany)

    2013-05-15

    We present molecular-dynamics simulations of the sputtering of an impurity atom off a Si 2×1 (100) surface by 2 keV Ar ions. The impurity is characterized by its mass and its binding energy to the Si substrate. We find that sputtering strongly decreases with the mass and even more strongly with the binding energy of the impurity atom to the matrix. The velocity of the impurity perpendicular to the surface is reduced with increasing impurity mass and binding energy. In terms of available ionization theories we can conclude that heavier impurities will have a smaller ionization probability.

  2. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  3. Elementary surface processes during reactive magnetron sputtering of chromium

    Energy Technology Data Exchange (ETDEWEB)

    Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von [Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum (Germany)

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  4. How Bright Is the Sun?

    Science.gov (United States)

    Berr, Stephen

    1991-01-01

    Presents a sequence of activities designed to allow eighth grade students to deal with one of the fundamental relationships that govern energy distribution. Activities guide students to measure light bulb brightness, discover the inverse square law, compare light bulb light to candle light, and measure sun brightness. (two references) (MCO)

  5. Sputtering deposition and characterization of ultrathin amorphous carbon films

    Science.gov (United States)

    Lu, Wei

    1999-11-01

    This dissertation focuses on experimental investigations of ultrathin, ultrasmooth amorphous carbon (a-C) films deposited on Si(100) substrates by radio frequency (RF) sputtering and characterization of the nanomechanical and nanotribological properties and thermal stability of the films. Ultrathin a-C films of thickness 5--100 nm and typical root-mean-square roughness of 0.15--1 nm were deposited on ultrasmooth Si(100) substrates using pure argon as the sputtering gas. A low-pressure RF argon discharge model was used to analyze the plasma parameters in the film growth environment. These plasma parameters correlate the deposition conditions with the film growth processes. Atomic force microscopy (AFM) and surface force microscopy (SFM) were used to characterize the nanomechanical and nanotribological properties of the a-C films. X-ray photoelectron spectroscopy (XPS) was used to investigate the compositions and microstructures of the films. Sputter-etching measurements of the a-C films by energetic argon ion bombardment were used to study the surface binding energy of carbon atoms in a-C films deposited under different conditions. The dependence of film properties on deposition conditions was studied, and relations between nanomechanical and nanotribological properties were discussed in terms of a modified deformation index. The deformation and nanotribology mechanisms of the a-C films were compared with those of other films, such as TiC and Cr films (both 100 nm thick), and bulk Si(100). Reactive RF sputtering of nitrogenated amorphous carbon (a-CNx) films was investigated by introducing nitrogen into the a-C films during film growth by using an argon-nitrogen gas mixture as the sputtering gas. The alloying effect of nitrogen on the film growth and properties, such as hardness and surface energy, was studied and interpreted in terms of the changes in the plasma environment induced due to differences in the composition of the sputtering gas mixture. The thermal

  6. Full System Model of Magnetron Sputter Chamber - Proof-of-Principle Study

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C; Gilmer, G; Zepeda-Ruiz, L; Wemhoff, A; Barbee, T

    2007-05-04

    The lack of detailed knowledge of internal process conditions remains a key challenge in magnetron sputtering, both for chamber design and for process development. Fundamental information such as the pressure and temperature distribution of the sputter gas, and the energies and arrival angles of the sputtered atoms and other energetic species is often missing, or is only estimated from general formulas. However, open-source or low-cost tools are available for modeling most steps of the sputter process, which can give more accurate and complete data than textbook estimates, using only desktop computations. To get a better understanding of magnetron sputtering, we have collected existing models for the 5 major process steps: the input and distribution of the neutral background gas using Direct Simulation Monte Carlo (DSMC), dynamics of the plasma using Particle In Cell-Monte Carlo Collision (PIC-MCC), impact of ions on the target using molecular dynamics (MD), transport of sputtered atoms to the substrate using DSMC, and growth of the film using hybrid Kinetic Monte Carlo (KMC) and MD methods. Models have been tested against experimental measurements. For example, gas rarefaction as observed by Rossnagel and others has been reproduced, and it is associated with a local pressure increase of {approx}50% which may strongly influence film properties such as stress. Results on energies and arrival angles of sputtered atoms and reflected gas neutrals are applied to the Kinetic Monte Carlo simulation of film growth. Model results and applications to growth of dense Cu and Be films are presented.

  7. 3D-modeling of Callisto's sputtered surface-exosphere environment

    Science.gov (United States)

    Lammer, Helmut; Pfleger, Martin; Lindqvist, Jesper; Lichtenegger, Herbert; Holmström, Mats; Vorburger, Audrey; Wurz, Peter; Barabash, Stas

    2016-04-01

    We study the stoichiometrical release of various surface elements caused by plasma sputtering from an assumed icy and non-icy (i.e., chondritic) surface into the exosphere of the Jovian satellite Callisto. We apply a 3D plasma planetary interaction hybrid model that is used for the evaluation of precipitation maps of magnetospheric H+, O+ and S+ sputter agents onto Callisto's surface. The obtained precipitation maps are then applied to the assumed surface compositions where the related sputter yields are calculated by means of the 2013 SRIM code and are coupled with a 3D exosphere model. Sputtered surface particles are followed on their individual trajectories until they either escape Callisto's gravitational attraction or return to the surface. We study also the effect of collisions between sputter species and ambient O2 molecules which form a tiny atmosphere near the satellite's surface and compare the exosphere densities that are obtained from the 3D model with and without a background gaseous envelope with recent 1D model results. Finally we discuss if the Neutral gas and Ion Mass (NIM) spectrometer, that is part of the Particle Environment Package (PEP) on board of the JUICE mission will be able to detect sputtered particles from Callisto's icy and non-icy surface.

  8. Are the argon metastables important in high power impulse magnetron sputtering discharges?

    Energy Technology Data Exchange (ETDEWEB)

    Gudmundsson, J. T., E-mail: tumi@hi.is [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland); Lundin, D.; Minea, T. M. [Laboratoire de Physique des Gaz et Plasmas - LPGP, UMR 8578 CNRS, Université Paris-Sud, 91405 Orsay Cedex (France); Stancu, G. D. [CentraleSupélec, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); CNRS, UPR 288 Laboratoire EM2C, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); Brenning, N. [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping (Sweden)

    2015-11-15

    We use an ionization region model to explore the ionization processes in the high power impulse magnetron sputtering (HiPIMS) discharge in argon with a titanium target. In conventional dc magnetron sputtering (dcMS), stepwise ionization can be an important route for ionization of the argon gas. However, in the HiPIMS discharge stepwise ionization is found to be negligible during the breakdown phase of the HiPIMS pulse and becomes significant (but never dominating) only later in the pulse. For the sputtered species, Penning ionization can be a significant ionization mechanism in the dcMS discharges, while in the HiPIMS discharge Penning ionization is always negligible as compared to electron impact ionization. The main reasons for these differences are a higher plasma density in the HiPIMS discharge, and a higher electron temperature. Furthermore, we explore the ionization fraction and the ionized flux fraction of the sputtered vapor and compare with recent experimental work.

  9. Surface charging of thick porous water ice layers relevant for ion sputtering experiments

    Science.gov (United States)

    Galli, A.; Vorburger, A.; Pommerol, A.; Wurz, P.; Jost, B.; Poch, O.; Brouet, Y.; Tulej, M.; Thomas, N.

    2016-07-01

    We use a laboratory facility to study the sputtering properties of centimeter-thick porous water ice subjected to the bombardment of ions and electrons to better understand the formation of exospheres of the icy moons of Jupiter. Our ice samples are as similar as possible to the expected moon surfaces but surface charging of the samples during ion irradiation may distort the experimental results. We therefore monitor the time scales for charging and discharging of the samples when subjected to a beam of ions. These experiments allow us to derive an electric conductivity of deep porous ice layers. The results imply that electron irradiation and sputtering play a non-negligible role for certain plasma conditions at the icy moons of Jupiter. The observed ion sputtering yields from our ice samples are similar to previous experiments where compact ice films were sputtered off a micro-balance.

  10. Coronal bright points associated with minifilament eruptions

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Junchao; Jiang, Yunchun; Yang, Jiayan; Bi, Yi; Li, Haidong [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Yang, Bo; Yang, Dan, E-mail: hjcsolar@ynao.ac.cn [Also at Graduate School of Chinese Academy of Sciences, Beijing, China. (China)

    2014-12-01

    Coronal bright points (CBPs) are small-scale, long-lived coronal brightenings that always correspond to photospheric network magnetic features of opposite polarity. In this paper, we subjectively adopt 30 CBPs in a coronal hole to study their eruptive behavior using data from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory. About one-quarter to one-third of the CBPs in the coronal hole go through one or more minifilament eruption(s) (MFE(s)) throughout their lifetimes. The MFEs occur in temporal association with the brightness maxima of CBPs and possibly result from the convergence and cancellation of underlying magnetic dipoles. Two examples of CBPs with MFEs are analyzed in detail, where minifilaments appear as dark features of a cool channel that divide the CBPs along the neutral lines of the dipoles beneath. The MFEs show the typical rising movements of filaments and mass ejections with brightenings at CBPs, similar to large-scale filament eruptions. Via differential emission measure analysis, it is found that CBPs are heated dramatically by their MFEs and the ejected plasmas in the MFEs have average temperatures close to the pre-eruption BP plasmas and electron densities typically near 10{sup 9} cm{sup –3}. These new observational results indicate that CBPs are more complex in dynamical evolution and magnetic structure than previously thought.

  11. Modeling target erosion during reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Strijckmans, K., E-mail: Koen.Strijckmans@ugent.be; Depla, D.

    2015-03-15

    Highlights: • The erosion of a target is simulated with the RSD2013 software during reactive magnetron sputtering. • The influence of redeposition on the target state and on the hysteresis is explained. • The racetrack formation along the hysteresis and as function of the redeposition is quantified. • Comparison of the racetrack and the sputter profile shows clear differences. - Abstract: The influence of the reactive sputter conditions on the racetrack and the sputter profile for an Al/O{sub 2} DC reactive sputter system is studied by modeling. The role of redeposition, i.e. the deposition of sputtered material back on the target, is therefore taken into account. The used model RSD2013 is capable of simulating the effect of redeposition on the target condition in a spatial resolved way. Comparison between including and excluding redeposition in the RSD2013 model shows that the in-depth oxidation profile of the target differs. Modeling shows that it is important to distinguish between the formed racetrack, i.e. the erosion depth profile, and the sputter profile. The latter defines the distribution of the sputtered atoms in the vacuum chamber. As the target condition defines the sputter yield, it does determine the racetrack and the sputter profile of the planar circular target. Both the shape of the racetrack and the sputter profile change as function of the redeposition fraction as well as function of the oxygen flow change. Clear asymmetries and narrowing are observed for the racetrack shape. Similar effects are noticed for the sputter profile but to a different extent. Based on this study, the often heard misconception that the racetrack shape defines the distribution of the sputtered atoms during reactive sputtering is proven to be wrong.

  12. Metal plasmas for the fabrication of nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2006-09-21

    A review is provided covering metal plasma production, theenergetic condensation of metal plasmas, and the formation ofnanostructures using such plasmas. Plasma production techniques includepulsed laser ablation, filtered cathodic arcs, and various forms ofionized physical vapor deposition, namely magnetron sputtering withionization of sputtered atoms in radio frequency discharges,self-sputtering, and high power impulse magnetron sputtering. Thediscussion of energetic condensation focuses on the control of kineticenergy by biasing and also includes considerations of the potentialenergy and the processes occurring at subplantation and implantation. Inthe final section on nanostructures, two different approaches arediscussed. In the top-down approach, the primary nanostructures arelithographically produced and metal plasma is used to coat or filltrenches and vias. Additionally, multilayers with nanosize periods(nanolaminates) can be produced. In the bottom-up approach, thermodynamicforces are used to fabricate nanocomposites and nanoporous materials bydecomposition and dealloying.

  13. Bright morning light advances the human circadian system without affecting NREM sleep homeostasis

    NARCIS (Netherlands)

    Dijk, Derk Jan; Beersma, Domien G.M.; Daan, Serge; Lewy, Alfred J.

    1989-01-01

    Eight male subjects were exposed to either bright light or dim light between 0600 and 0900 h for 3 consecutive days each. Relative to the dim light condition, the bright light treatment advanced the evening rise in plasma melatonin and the time of sleep termination (sleep onset was held constant) fo

  14. High-current-density, high brightness cathodes for free electron laser applications

    Energy Technology Data Exchange (ETDEWEB)

    Green, M.C. (Varian Associates, Palo Alto, CA (USA). Palo Alto Microwave Tube Div.)

    1987-06-01

    This report discusses the following topics: brightness and emittance of electron beams and cathodes; general requirements for cathodes in high brightness electron guns; candidate cathode types; plasma and field emission cathodes; true field emission cathodes; oxide cathodes; lanthanum hexaborides cathodes; laser driven thermionic cathodes; laser driven photocathodes; impregnated porous tungsten dispenser cathodes; and choice of best performing cathode types.

  15. Aftereffect of Adaptation to Illusory Brightness

    OpenAIRE

    Xinguang Cao; Hiroyuki Ito

    2011-01-01

    Several figures are known to induce illusory brightness. We tested whether adaptation to illusory brightness produced an aftereffect in brightness. After viewing a gray square area having illusory brightness (e.g., due to brightness contrast or illusory contours) for ten seconds, the illusion-inducing surround vanished. After three seconds, subjects reported whether the square area was seen as brighter than, darker than, or the same brightness as a control gray square area. The luminance of t...

  16. In-situ sputtering apparatus

    Science.gov (United States)

    Erickson, Mark R.; Poole, Henry J.; Custer, III, Arthur W.; Hershcovitch, Ady

    2015-06-09

    A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

  17. Observations and analysis of FTU plasmas by video cameras

    Energy Technology Data Exchange (ETDEWEB)

    De Angelis, R. [Associazione Euratom/ENEA sulla fusione, CP 65-00044 Frascati, Rome (Italy); Di Matteo, L., E-mail: lucy.dimatteo@enea.i [ENEA Fellow, Via E. Fermi, Frascati (Italy)

    2010-11-11

    The interaction of the FTU plasma with the vessel walls and with the limiters is responsible for the release of hydrogen and impurities through various physical mechanisms (physical and chemical sputtering, desorption, etc.). In the cold plasma periphery, these particles are weakly ionised and emit mainly in the visible spectral range. A good description of plasma periphery can then be obtained by use of video cameras. In FTU small size video cameras, placed close to the plasma edge, give wide-angle images of the plasma at a standard rate of 25 frames/s. Images are stored digitally, allowing their retrieval and analysis. This paper reports some of the most interesting features of the discharges evidenced by the images. As a first example, the accumulation of cold neutral gas in the plasma periphery above a density threshold (a phenomenon known as Marfe) can be seen on the video images as a toroidally symmetric band oscillating poloidally; on the multi-chord spectroscopy or bolometer channels, this appears only as a sudden rise of the signals whose overall behaviour could not be clearly interpreted. A second example is the identification of runaway discharges by the signature of the fast electrons emitting synchrotron radiation in their motion direction; this appears as a bean shaped bright spot on one toroidal side, which reverts according to plasma current direction. A relevant side effect of plasma discharges, as potentially dangerous, is the formation of dust as a consequence of some strong plasma-wall interaction event; video images allow monitoring and possibly estimating numerically the amount of dust, which can be produced in these events. Specialised software can automatically search experimental database identifying relevant events, partly overcoming the difficulties associated with the very large amount of data produced by video techniques.

  18. Collision-spike Sputtering of Au Nanoparticles.

    Science.gov (United States)

    Sandoval, Luis; Urbassek, Herbert M

    2015-12-01

    Ion irradiation of nanoparticles leads to enhanced sputter yields if the nanoparticle size is of the order of the ion penetration depth. While this feature is reasonably well understood for collision-cascade sputtering, we explore it in the regime of collision-spike sputtering using molecular-dynamics simulation. For the particular case of 200-keV Xe bombardment of Au particles, we show that collision spikes lead to abundant sputtering with an average yield of 397 ± 121 atoms compared to only 116 ± 48 atoms for a bulk Au target. Only around 31 % of the impact energy remains in the nanoparticles after impact; the remainder is transported away by the transmitted projectile and the ejecta. The sputter yield of supported nanoparticles is estimated to be around 80 % of that of free nanoparticles due to the suppression of forward sputtering.

  19. Ion sputtered deposit analysis by electron microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Lundquist, T.R.; Kraus, B.; Swann, P.R. (GATAN, Inc., Warrendale, PA (USA))

    1983-12-15

    The collected deposit formed by sputtering a specimen provides a permanent record of the elemental surface composition. For analysis by X-rays or energy loss in a transmission electron microscope, all the sputtered particles (both ions and neutrals) are collected on a carbon or SiO thin film. Surface analysis can be obtained by exposing different areas of the specimen to the ion beam. Information available in the angular distributions of sputtered particles is retained on the thin film substrate. Depth profiling can be performed by the sequential exposure of different areas of the thin film substrate to the sputtered specimen particles. Examples from stainless steels and silicon compounds are given. The advantage of this ion sputtered deposit analysis (ISDA) technique, apart from its collection efficiency, is its ability to store permanently all the elemental information obtained from a particular experiment. This information can then be processed in a parallel or serial fashion at any time after the sputtering experiment.

  20. Epitaxial Growth of Rhenium with Sputtering

    Science.gov (United States)

    2016-05-06

    match (a = 2.76 Å) to the oxygen sublattice (a = 2.77 Å) of α-Al2O3 (0001) [2]. Re also has a reasonably high superconducting critical temperature...to copyright. Keywords: Epitaxy, Rhenium, Sputtering 1. Introduction Epitaxial superconducting films of refractory metals are a promising new...than the RF sputtered films. These differences are most likely due to the fact that RF sputtering has more of an etching effect on the sample

  1. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber : The influence of substrate bias

    NARCIS (Netherlands)

    Bui, X.L.; Pei, Y.T.; Hosson, J.Th.M. De

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si

  2. Characterization of high power impulse magnetron sputtering discharges

    Science.gov (United States)

    Hala, Matej

    Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution—time- and species-resolved plasma imaging—employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 µs long non-reactive HiPIMS discharges using a Cr target. Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 µs long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere. Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 µs long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and

  3. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    Sudhir Chandra; Vivekanand Bhatt; Ravindra Singh

    2009-08-01

    Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires deposition of films such as SiO2, Si34, ZnO, polysilicon, phosphosilicate glass (PSG), Al, Cr-Au, Pt, etc. for use as structural, sacrificial, piezoelectric and conducting material. Deposition of these materials at low temperature is desirable for fabricating sensors/actuators on temperature-sensitive substrates and also for integrating MEMS structures on silicon in post-CMOS processing procedures. Plasma enhanced chemical vapour deposition (PECVD) and sputtering are amongst potential techniques for preparing films for MEMS fabrication at comparatively low temperatures. The sputtering technique has an added advantage that the process is carried out in an inert ambient (argon) and chemically sensitive substrate/sacrificial layers can be used in realization of MEMS. Furthermore, the same system can be used for depositing dielectric, piezoelectric and conducting materials as per requirement in the fabrication sequence. This enables rapid low-cost prototyping of MEMS with minimum fabrication facilities. In the present work, we report preparation, characterization and application of RF sputtered SiO2, Si34 and ZnO films for MEMS fabrication. The effect of RF power, sputtering pressure and target-to-substrate spacing was investigated on the structural and other properties of the films. The residual stress in the films was obtained using wafer curvature measurement technique. The deposition parameters are optimized to obtain low stress films of SiO2 and Si34. The self-heating of the substrate during deposition was advantageously exploited to obtain highly -axis oriented films of ZnO without any external heating. A variety of MEMS structures such as cantilever beams, micro-bridges, diaphragms, etc. are demonstrated using bulk, surface and surface-bulk micromachining techniques.

  4. Low yield sputtering of monocrystalline metals

    NARCIS (Netherlands)

    Veen, A. van; Fluit, J.M.

    1980-01-01

    Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretically at low primary ion energy. Evidence is found for a multiple collision process in which surface atoms are sputtered by backscattered ions. The introduction of the maximum recoil energy EM in the s

  5. Confined ion beam sputtering device and method

    Science.gov (United States)

    Sharp, D.J.

    1986-03-25

    A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received through either one or both ends of the open cylindrical target is forced by a negative bias applied to the target to diverge so that ions impinge at acute angles at different points of the cylindrical target surface. The ion impingement results in a radially inward and downstream directed flux of sputter deposit particles that are received by the substrate. A positive bias applied to the substrate enhances divergence of the approaching ion beams to generate a higher sputtered deposition flux rate. Alternatively, a negative bias applied to the substrate induces the core portion of the ion beams to reach the substrate and provide ion polishing of the sputtered deposit thereon.

  6. Rf sputtering of CdTE and CdS for thin film PV

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.D.; Tabory, C.N.; Shao, M.; Fischer, A.; Feng, Z.; Bohn, R.G. (Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States))

    1994-06-30

    In late 1992 we demonstrated the first rf sputtered CdS/CdTe photovoltaic cell with efficiency exceeding 10%. In this cell both CdS and CdTe layers were deposited by rf sputtering. In this paper we report preliminary measurements of (1) optical emission spectroscopy of the rf plasma, (2) the width of the phonon Raman line as a function of deposition temperature for CdS, and (3) studies of oxygen doping during pulsed laser deposition of CdTe.

  7. Consecutive Bright Pulses in the Vela Pulsar

    CERN Document Server

    Palfreyman, Jim L; Dickey, John M; Young, Timothy G; Hotan, Claire E; 10.1088/2041-8205/735/1/L17

    2011-01-01

    We report on the discovery of consecutive bright radio pulses from the Vela pulsar, a new phenomenon that may lead to a greater understanding of the pulsar emission mechanism. This results from a total of 345 hr worth of observations of the Vela pulsar using the University of Tasmania's 26 m radio telescope to study the frequency and statistics of abnormally bright pulses and sub-pulses. The bright pulses show a tendency to appear consecutively. The observations found two groups of six consecutive bright pulses and many groups of two to five bright pulses in a row. The strong radio emission process that produces the six bright pulses lasts between 0.4 and 0.6 s. The numbers of bright pulses in sequence far exceed what would be expected if individual bright pulses were independent random events. Consecutive bright pulses must be generated by an emission process that is long lived relative to the rotation period of the neutron star.

  8. Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Simon, Daniel K., E-mail: daniel.simon@namlab.com; Schenk, Tony; Dirnstorfer, Ingo; Fengler, Franz P. G.; Jordan, Paul M.; Krause, Andreas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden (Germany); Tröger, David [Westsächsische Hochschule Zwickau, Fachgruppe Nanotechnologie, Dr.-Friedrichs-Ring 2a, 08056 Zwickau (Germany); Mikolajick, Thomas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany and TU Dresden, Institut für Halbleiter- und Mikrosystemtechnik (IHM), 01062 Dresden (Germany)

    2016-03-15

    Radio frequency (RF) biasing induced by a second plasma source at the substrate is applied to low-temperature sputtering processes for indium tin oxide (ITO) and titanium nitride (TiN) thin films. Investigations on crystal structure and surface morphology show that RF-biased substrate plasma processes result in a changed growth regime with different grain sizes and orientations than those produced by processes without a substrate bias. The influence of the RF bias is shown comparatively for reactive RF-sputtered ITO and reactive direct-current-sputtered TiN. The ITO layers exhibit an improved electrical resistivity of 0.5 mΩ cm and an optical absorption coefficient of 0.5 × 10{sup 4 }cm{sup −1} without substrate heating. Room-temperature sputtered TiN layers are deposited that possess a resistivity (0.1 mΩ cm) of 3 orders of magnitude lower than, and a density (5.4 g/cm{sup 3}) up to 45% greater than, those obtained from layers grown using the standard process without a substrate plasma.

  9. Reactive sputtering of δ-ZrH{sub 2} thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Högberg, Hans, E-mail: hans.hogberg@liu.se; Tengdelius, Lina; Eriksson, Fredrik; Broitman, Esteban; Lu, Jun; Jensen, Jens; Hultman, Lars [Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Samuelsson, Mattias [Impact Coatings AB, Westmansgatan 29, SE-582 16 Linköping (Sweden)

    2014-07-01

    Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H{sub 2} plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis. X-ray photoelectron spectroscopy reveals a chemical shift of ∼0.7 eV to higher binding energies for the Zr-H films compared to pure Zr films, consistent with a charge transfer from Zr to H in a zirconium hydride. X-ray diffraction shows that the films are single-phase δ-ZrH{sub 2} (CaF{sub 2} type structure) at H content >∼55 at. % and pole figure measurements give a 111 preferred orientation for these films. Scanning electron microscopy cross-section images show a glasslike microstructure for the HiPIMS films, while the DCMS films are columnar. Nanoindentation yield hardness values of 5.5–7 GPa for the δ-ZrH{sub 2} films that is slightly harder than the ∼5 GPa determined for Zr films and with coefficients of friction in the range of 0.12–0.18 to compare with the range of 0.4–0.6 obtained for Zr films. Wear resistance testing show that phase-pure δ-ZrH{sub 2} films deposited by HiPIMS exhibit up to 50 times lower wear rate compared to those containing a secondary Zr phase. Four-point probe measurements give resistivity values in the range of ∼100–120 μΩ cm for the δ-ZrH{sub 2} films, which is slightly higher compared to Zr films with values in the range 70–80 μΩ cm.

  10. Brightness-equalized quantum dots

    Science.gov (United States)

    Lim, Sung Jun; Zahid, Mohammad U.; Le, Phuong; Ma, Liang; Entenberg, David; Harney, Allison S.; Condeelis, John; Smith, Andrew M.

    2015-10-01

    As molecular labels for cells and tissues, fluorescent probes have shaped our understanding of biological structures and processes. However, their capacity for quantitative analysis is limited because photon emission rates from multicolour fluorophores are dissimilar, unstable and often unpredictable, which obscures correlations between measured fluorescence and molecular concentration. Here we introduce a new class of light-emitting quantum dots with tunable and equalized fluorescence brightness across a broad range of colours. The key feature is independent tunability of emission wavelength, extinction coefficient and quantum yield through distinct structural domains in the nanocrystal. Precise tuning eliminates a 100-fold red-to-green brightness mismatch of size-tuned quantum dots at the ensemble and single-particle levels, which substantially improves quantitative imaging accuracy in biological tissue. We anticipate that these materials engineering principles will vastly expand the optical engineering landscape of fluorescent probes, facilitate quantitative multicolour imaging in living tissue and improve colour tuning in light-emitting devices.

  11. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith;

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution of the s......Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...... of the sputtered particles....

  12. Nanoscale growth twins in sputtered metal films

    Energy Technology Data Exchange (ETDEWEB)

    Misra, Amit [Los Alamos National Laboratory; Anderoglu, Osman [Los Alamos National Laboratory; Hoagland, Richard G [Los Alamos National Laboratory; Zhang, X [TEXAS A& M

    2008-01-01

    We review recent studies on the mechanical properties of sputtered Cu and 330 stainless steel films with {l_brace}1 1 1{r_brace} nanoscale growth twins preferentially oriented perpendicular to growth direction. The mechanisms of formation of growth twins during sputtering and the deformation mechanisms that enable usually high strengths in nanotwinned structures are highlighted. Growth twins in sputtered films possess good thermal stability at elevated temperature, providing an approach to extend the application of high strength nanostructured metals to higher temperatures.

  13. High brightness semiconductor lasers with reduced filamentation

    DEFF Research Database (Denmark)

    McInerney, John; O'Brien, Peter.; Skovgaard, Peter M. W.;

    1999-01-01

    High brightness semiconductor lasers have applications in spectroscopy, fiber lasers, manufacturing and materials processing, medicine and free space communication or energy transfer. The main difficulty associated with high brightness is that, because of COD, high power requires a large aperture...

  14. 14% sputtered thin-film solar cells based on CdTe

    Science.gov (United States)

    Compaan, A. D.; Gupta, A.; Drayton, J.; Lee, S.-H.; Wang, S.

    2004-02-01

    Polycrystalline II-VI semiconductor materials show great promise for thin-film photovoltaic cells and modules. Large-area deposition of these II-VI semiconductors such as CdTe is possible by a variety of methods but the use of a plasma-based method such as magnetron sputtering can have significant advantages. Here we present recent results in the fabrication of CdS/CdTe cells using rf magnetron sputtering and discuss some of the advantages that appear possible from the use of sputtering methods in this class of materials. Some of these advantages are particularly relevant as the polycrystalline thin-film PV community addresses issues related to the challenges of fabricating high efficiency tandem cells with efficiencies over 25%. Our best results have been obtained with sputtered ZnO:Al to achieve a CdTe solar cell with 14.0% efficiency at one sun for an air-mass-1.5 global spectrum. In addition, we have studied reactive sputtering of ZnTe:N which shows promise for use as a transparent back contact or recombination junction for alloyed II-VI-based top cells in a tandem solar-cell configuration.

  15. High-brightness rf linear accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Jameson, R.A.

    1986-01-01

    The issue of high brightness and its ramifications in linacs driven by radio-frequency fields is discussed. A history of the RF linacs is reviewed briefly. Some current applications are then examined that are driving progress in RF linacs. The physics affecting the brightness of RF linacs is then discussed, followed by the economic feasibility of higher brightness machines. (LEW)

  16. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  17. Quantitative studies of cleaved and sputtered CuInSe2 surfaces

    Science.gov (United States)

    Massopust, T. P.; Ireland, P. J.; Kazmerski, L. L.; Bachmann, K. J.

    1984-06-01

    A method is presented for the quantitative Auger electron spectroscopy of semiconductor compounds, and applications are reported for CuInSe2, with accuracies to within 2 at. pct. In the analysis, N(E) and dN(E)/dE data are used, and spectra are obtained by pulse counting, beam brightness modulation, and analyzer energy modulation. Preferential sputtering and oxidation effects are considered in the analysis of CuInSe2 cleaved crystals and vacuum-deposited thin films.

  18. Sputtering of sodium on the planet Mercury

    Science.gov (United States)

    Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.

    1986-01-01

    It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.

  19. The lunar exosphere: The sputtering contribution

    Science.gov (United States)

    Wurz, P.; Rohner, U.; Whitby, J. A.; Kolb, C.; Lammer, H.; Dobnikar, P.; Martín-Fernández, J. A.

    2007-11-01

    We have extended our Monte Carlo model of exospheres [Wurz, P., Lammer, H., 2003. Icarus 164 (1), 1-13] by treating the ion-induced sputtering process from a known surface in a self-consistent way. The comparison of the calculated exospheric densities with experimental data, which are mostly upper limits, shows that all of our calculated densities are within the measurement limits. The total calculated exospheric density at the lunar surface of about 1×10 m as result of solar wind sputtering we find is much less than the experimental total exospheric density of about 10 m. We conclude that sputtering contributes only a small fraction of the total exosphere, at least close to the surface. Because of the considerably larger scale height of atoms released via sputtering into the exosphere, sputtered atoms start to dominate the exosphere at altitudes exceeding a few 1000 km, with the exception of some light and abundant species released thermally, e.g. H 2, He, CH 4, and OH. Furthermore, for more refractory species such as calcium, our model indicates that sputtering may well be the dominant mechanism responsible for the lunar atmospheric inventory, but observational data does not yet allow firm conclusions to be drawn.

  20. Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

    Directory of Open Access Journals (Sweden)

    Chodun Rafal

    2015-12-01

    Full Text Available Encouraged by recent studies and considering the well-documented problems occurring during AlN synthesis, we have chosen two diagnostic methods which would enable us to fully control the process of synthesis and characterize the synthesized aluminum nitride films. In our experiment we have compared the results coming from OES measurements of plasma and circulating power characteristics of the power supply with basic features of the deposited layers. The dual magnetron system operating in AC mode was used in our studies. Processes of aluminum target sputtering were carried out in an atmosphere of a mixture of argon and nitrogen. The plasma emission spectra were measured with the use of a monochromator device. Analyses were made by comparing the positions and intensities of spectral lines of the plasma components. The results obtained allowed us to characterize the sputtering process under various conditions of gas mixture compositions as well as power distribution more precisely, which is reported in this work. The measured spectra were related to the deposition rate, the structure morphology of the films and chemical composition. Our work proved that the use of plasma OES and circulating power measurements make possible to control the process of sputtering and synthesis of deposited films in situ.

  1. DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS

    Energy Technology Data Exchange (ETDEWEB)

    High Current Electronics Institute, Tomsk, Russia; Anders, Andre; Mendelsberg, Rueben J.; Lim, Sunnie; Mentink, Matthijs; Slack, Jonathan L.; Wallig, Joseph G.; Nollau, Alexander V.; Yushkov, Georgy Yu.

    2011-07-24

    Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm{sup 2}. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and the resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.

  2. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  3. Laser sputtering of highly oriented pyrolytic graphite at 248 nm

    Science.gov (United States)

    Krajnovich, Douglas J.

    1995-01-01

    The interaction of excimer laser pulses with a highly oriented pyrolytic graphite (HOPG) target has been studied. HOPG, a close approximation to single crystal graphite, was irradiated along a freshly cleaved basal plane in vacuum by pulses from a KrF excimer laser. The energy fluence was varied between 300-700 mJ/cm2, resulting in material removal rates of plasma effects are minimized. Time-of-flight distributions of the neutral carbon atoms and small carbon clusters were measured and inverted to obtain translational energy flux distributions and relative sputtering yields as a function of fluence. The translational energy distributions are remarkably close to Maxwell-Boltzmann distributions over most of the fluence range studied. However, the mean translational energies are far too high to reconcile with a simple thermal vaporization model. For example, the mean translational energy of C3, the most abundant species, increases from 1.1 eV at 305 mJ/cm2 to 31.7 eV at 715 mJ/cm2. Explanations are considered for this curious mix of thermal and non-thermal behavior. At the high end of our fluence range, the mean translational energies of C1, C2, C3 converge to a 1:2:3 ratio, indicating that the velocity distributions are almost identical. This particular result can be interpreted as a gas dynamic effect. Prolonged sputtering of the same target spot results in a falloff in the sputtering yield and the mean translational energies, but little change in the cluster size distribution. These effects are related to impurity induced topography formation on the target surface.

  4. Sputtered film thermistor IR detectors

    Science.gov (United States)

    Baliga, Shankar B.; Rost, Martin R.; Doctor, Alan P.

    1994-07-01

    The thermistor infrared detector or bolometer is the detector of choice in many classical remote sensing applications such as horizon sensing, noncontact thermometry, and industrial applications. In recent years, the authors have developed a thin film process where the thermistor material is deposited from a target directly onto the substrate. This is an advance over the labor intensive ceramic technology, where sintered flakes of the thermistor are bonded to the substrate. The thin film technique permits a variety of device constructions and configurations. Detectors fabricated on heat-sunk ceramic substrates can withstand high operating temperatures and large incident optical power, in both pulsed and CW laser measurements. For dc or low frequency measurements, the films can be deposited onto a thermally isolated membrane with applications in motion sensing, gas detection, and temperature measurement. Utilizing advances in micromachining a 2D array of thermally isolated microbolometer sensors, integrated onto a silicon wafer containing readout circuitry may be achieved. This paper describes the construction of the sputtered film thermistor detectors, their operation, and applications.

  5. Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films

    OpenAIRE

    2009-01-01

    This paper reports the outlines of hollow cathode (HCD) lamp absorption system for the density measurement of sputtered metal atoms in the inductively coupled plasma (ICP) assisted sputter-deposition process of Al doped ZnO thin films. As a result, absorbance of about 6.5% was obtained, which corresponds to the Zn atom density of 1.5×1012 cm-3.

  6. High Brightness Neutron Source for Radiography

    Energy Technology Data Exchange (ETDEWEB)

    Cremer, J. T.; Piestrup, Melvin, A.; Gary, Charles, K.; Harris, Jack, L. Williams, David, J.; Jones, Glenn, E.; Vainionpaa, J. , H.; Fuller, Michael, J.; Rothbart, George, H.; Kwan, J., W.; Ludewigt, B., A.; Gough, R.., A..; Reijonen, Jani; Leung, Ka-Ngo

    2008-12-08

    This research and development program was designed to improve nondestructive evaluation of large mechanical objects by providing both fast and thermal neutron sources for radiography. Neutron radiography permits inspection inside objects that x-rays cannot penetrate and permits imaging of corrosion and cracks in low-density materials. Discovering of fatigue cracks and corrosion in piping without the necessity of insulation removal is possible. Neutron radiography sources can provide for the nondestructive testing interests of commercial and military aircraft, public utilities and petrochemical organizations. Three neutron prototype neutron generators were designed and fabricated based on original research done at the Lawrence Berkeley National Laboratory (LBNL). The research and development of these generators was successfully continued by LBNL and Adelphi Technology Inc. under this STTR. The original design goals of high neutron yield and generator robustness have been achieved, using new technology developed under this grant. In one prototype generator, the fast neutron yield and brightness was roughly 10 times larger than previously marketed neutron generators using the same deuterium-deuterium reaction. In another generator, we integrate a moderator with a fast neutron source, resulting in a high brightness thermal neutron generator. The moderator acts as both conventional moderator and mechanical and electrical support structure for the generator and effectively mimics a nuclear reactor. In addition to the new prototype generators, an entirely new plasma ion source for neutron production was developed. First developed by LBNL, this source uses a spiral antenna to more efficiently couple the RF radiation into the plasma, reducing the required gas pressure so that the generator head can be completely sealed, permitting the possible use of tritium gas. This also permits the generator to use the deuterium-tritium reaction to produce 14-MeV neutrons with increases

  7. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  8. Protective infrared antireflection coating based on sputtered germanium carbide

    Science.gov (United States)

    Gibson, Des; Waddell, Ewan; Placido, Frank

    2011-09-01

    This paper describes optical, durablility and environmental performance of a germanium carbide based durable antireflection coating. The coating has been demonstrated on germanium and zinc selenide infra-red material however is applicable to other materials such as zinc sulphide. The material is deposited using a novel reactive closed field magnetron sputtering technique, offering significant advantages over conventional evaporation processes for germanium carbide such as plasma enhanced chemical vapour deposition. The sputtering process is "cold", making it suitable for use on a wide range of substrates. Moreover, the drum format provide more efficient loading for high throughput production. The use of the closed field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress. Films incorporate low hydrogen content resulting in minimal C-H absorption bands within critical infra-red passbands such as 3 to 5um and 8 to 12um. Tuning of germanium carbide (Ge(1-x)Cx) film refractive index from pure germanium (refractive index 4) to pure germanium carbide (refractive index 1.8) will be demonstrated. Use of film grading to achieve single and dual band anti-reflection performance will be shown. Environmental and durability levels are shown to be suitable for use in harsh external environments.

  9. Ion beam sputtering of Ag – Angular and energetic distributions of sputtered and scattered particles

    Energy Technology Data Exchange (ETDEWEB)

    Feder, René, E-mail: rene.feder@iom-leipzig.de; Bundesmann, Carsten; Neumann, Horst; Rauschenbach, Bernd

    2013-12-01

    Ion beam sputter deposition (IBD) provides intrinsic features which influence the properties of the growing film, because ion properties and geometrical process conditions generate different energy and spatial distribution of the sputtered and scattered particles. A vacuum deposition chamber is set up to measure the energy and spatial distribution of secondary particles produced by ion beam sputtering of different target materials under variation of geometrical parameters (incidence angle of primary ions and emission angle of secondary particles) and of primary ion beam parameters (ion species and energies). A representative set of Ag thin films is deposited arranged on a substrate holder equatorial to the Ag target in steps of 10° and characterized concerning their film thickness by profilometry to determine the angular distribution of the sputtered particles. The film thickness distributions show a tilted, cosine-like shape and a shifting of the maximum position depending on the primary particle energy and incidence angle of the primary ions. The energy distributions of sputtered and scattered ions and of sputtered neutrals are measured with an energy-selective mass spectrometer. The average energy of the sputtered ions increases with increasing emission angle and also increases with increasing incidence angle of the primary ions. In contrast, the average energy of the sputtered ions is nearly unaffected by the primary particle energy and particle species. The energy distribution of the scattered Ar ions reveals high energetic maxima which shift with increasing emission angle to higher energies. These maxima are not observed for Xe bombardment. The total energies of sputtered and scattered ions show significant differences between the two bombarding species. The maximum of the energy distribution of sputtered Ag neutrals is used to conclude on the surface binding energy of Ag (2.72 eV). All experimental data are compared with Monte Carlo simulations done with

  10. Deuterium Retention and Physical Sputtering of Low Activation Ferritic Steel

    Institute of Scientific and Technical Information of China (English)

    T. Hino; K. Yamaguchi; Y. Yamauchi; Y. Hirohata; K. Tsuzuki; Y.Kusama

    2005-01-01

    Low activation materials have to be developed toward fusion demonstration reactors. Ferritic steel, vanadium alloy and SiC/SiC composite are candidate materials of the first wall,vacuum vessel and blanket components, respectively. Although changes of mechanical-thermal properties owing to neutron irradiation have been investigated so far, there is little data for the plasma material interactions, such as fuel hydrogen retention and erosion. In the present study,deuterium retention and physical sputtering of low activation ferritic steel, F82H, were investigated by using deuterium ion irradiation apparatus.After a ferritic steel sample was irradiated by 1.7 kev D+ ions, the weight loss was measured to obtain the physical sputtering yield. The sputtering yield was 0.04, comparable to that of stainless steel. In order to obtain the retained amount of deuterium, technique of thermal desorption spectroscopy (TDS) was employed to the irradiated sample. The retained deuterium desorbed at temperature ranging from 450 K to 700 K, in the forms of DHO, D2, D2O and hydrocarbons. Hence, the deuterium retained can be reduced by baking with a relatively low temperature. The fluence dependence of retained amount of deuterium was measured by changing the ion fluence. In the ferritic steel without mechanical polish, the retained amount was large even when the fluence was low. In such a case, a large amount of deuterium was trapped in the surface oxide layer containing O and C. When the fluence was large, the thickness of surface oxide layer was reduced by the ion sputtering, and then the retained amount in the oxide layer decreased. In the case of a high fluence, the retained amount of deuterium became comparable to that of ferritic steel with mechanical polish or SS 316 L, and one order of magnitude smaller than that of graphite. When the ferritic steel is used, it is required to remove the surface oxide layer for reduction of fuel hydrogen retention.Ferritic steel sample was

  11. How Bright Can Supernovae Get?

    Science.gov (United States)

    Kohler, Susanna

    2016-04-01

    Supernovae enormous explosions associated with the end of a stars life come in a variety of types with different origins. A new study has examined how the brightest supernovae in the Universe are produced, and what limits might be set on their brightness.Ultra-Luminous ObservationsRecent observations have revealed many ultra-luminous supernovae, which haveenergies that challenge our abilities to explain them usingcurrent supernova models. An especially extreme example is the 2015 discovery of the supernova ASASSN-15lh, which shone with a peak luminosity of ~2*1045 erg/s, nearly a trillion times brighter than the Sun. ASASSN-15lh radiated a whopping ~2*1052 erg in the first four months after its detection.How could a supernova that bright be produced? To explore the answer to that question, Tuguldur Sukhbold and Stan Woosley at University of California, Santa Cruz, have examined the different sources that could produce supernovae and calculated upper limits on the potential luminosities ofeach of these supernova varieties.Explosive ModelsSukhbold and Woosley explore multiple different models for core-collapse supernova explosions, including:Prompt explosionA stars core collapses and immediately explodes.Pair instabilityElectron/positron pair production at a massive stars center leads to core collapse. For high masses, radioactivity can contribute to delayed energy output.Colliding shellsPreviously expelled shells of material around a star collide after the initial explosion, providing additional energy release.MagnetarThe collapsing star forms a magnetar a rapidly rotating neutron star with an incredibly strong magnetic field at its core, which then dumps energy into the supernova ejecta, further brightening the explosion.They then apply these models to different types of stars.Setting the LimitThe authors show that the light curve of ASASSN-15lh (plotted in orange) can be described by a model (black curve) in which a magnetar with an initial spin period of 0.7 ms

  12. VERITAS Observations under Bright Moonlight

    CERN Document Server

    ,

    2015-01-01

    The presence of moonlight is usually a limiting factor for imaging atmospheric Cherenkov telescopes due to the high sensitivity of the camera photomultiplier tubes (PMTs). In their standard configuration, the extra noise limits the sensitivity of the experiment to gamma-ray signals and the higher PMT currents also accelerates PMT aging. Since fall 2012, observations have been carried out with VERITAS under bright moonlight (Moon illumination $> 35\\%$), in two observing modes, by reducing the voltage applied to the PMTs and with UV bandpass filters, which allow observations up to $\\sim80\\%$ Moon illumination resulting in $29\\%$ more observing time over the course of the year. In this presentation, we provide details of these new observing modes and their performance relative to the standard VERITAS observations.

  13. Tailoring of antibacterial Ag nanostructures on TiO2 nanotube layers by magnetron sputtering.

    Science.gov (United States)

    Uhm, Soo-Hyuk; Song, Doo-Hoon; Kwon, Jae-Sung; Lee, Sang-Bae; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-04-01

    To reduce the incidence of postsurgical bacterial infection that may cause implantation failure at the implant-bone interface, surface treatment of titanium implants with antibiotic materials such as silver (Ag) has been proposed. The purpose of this work was to create TiO2 nanotubes using plasma electrolytic oxidation (PEO), followed by formation of an antibacterial Ag nanostructure coating on the TiO2 nanotube layer using a magnetron sputtering system. PEO was performed on commercially pure Ti sheets. The Ag nanostructure was added onto the resulting TiO2 nanotube using magnetron sputtering at varying deposition rates. Field emission scanning electron microscopy and transmission electron microscopy were used to characterize the surface, and Ag content on the TiO2 nanotube layer was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. Scanning probe microscopy for surface roughness and contact angle measurement were used to indirectly confirm enhanced TiO2 nanotube hydrophilicity. Antibacterial activity of Ag ions in solution was determined by inductively coupled plasma mass spectrometry and antibacterial testing against Staphylococcus aureus (S. aureus). In vitro, TiO2 nanotubes coated with sputtered Ag resulted in significantly reduced S. aureus. Cell viability assays showed no toxicity for the lowest sputtering time group in the osteoblastic cell line MC3T3-E1. These results suggest that a multinanostructured layer with a biocompatible TiO2 nanotube and antimicrobial Ag coating is a promising biomaterial that can be tailored with magnetron sputtering for optimal performance.

  14. Sputtering of Lunar Regolith by Solar Wind Protons and Heavy Ions, and General Aspects of Potential Sputtering

    Science.gov (United States)

    Alnussirat, S. T.; Sabra, M. S.; Barghouty, A. F.; Rickman, Douglas L.; Meyer, F.

    2014-01-01

    New simulation results for the sputtering of lunar soil surface by solar-wind protons and heavy ions will be presented. Previous simulation results showed that the sputtering process has significant effects and plays an important role in changing the surface chemical composition, setting the erosion rate and the sputtering process timescale. In this new work and in light of recent data, we briefly present some theoretical models which have been developed to describe the sputtering process and compare their results with recent calculation to investigate and differentiate the roles and the contributions of potential (or electrodynamic) sputtering from the standard (or kinetic) sputtering.

  15. Molecular dynamics simulation of gold cluster growth during sputter deposition

    Science.gov (United States)

    Abraham, J. W.; Strunskus, T.; Faupel, F.; Bonitz, M.

    2016-05-01

    We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

  16. Thin films preparation of the Ti-Al-O system by rf-sputtering;Preparacion de peliculas delgadas del sistema Ti-Al-O mediante rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)

    2010-07-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  17. Aftereffect of Adaptation to Illusory Brightness

    Directory of Open Access Journals (Sweden)

    Xinguang Cao

    2011-05-01

    Full Text Available Several figures are known to induce illusory brightness. We tested whether adaptation to illusory brightness produced an aftereffect in brightness. After viewing a gray square area having illusory brightness (e.g., due to brightness contrast or illusory contours for ten seconds, the illusion-inducing surround vanished. After three seconds, subjects reported whether the square area was seen as brighter than, darker than, or the same brightness as a control gray square area. The luminance of the tested square area was physically unchanged. The results show that when the black surround inducing brightness contrast suddenly became gray (i.e., vanished, the center gray square tended to look darker than a control gray square. Similarly, after viewing a subjective square consisting of black-line terminations, the square area tended to look darker than the control even though the afterimage of the lines could not be seen. These results indicate that induced or illusory brightness causes an aftereffect in brightness regardless of the appearance of negative afterimages of the illusion-inducing components.

  18. Solar Wind Sputtering of Lunar Surface Materials: Role and Some Possible Implications of Potential Sputtering

    Science.gov (United States)

    Barghouty, A. F.; Adams, J. H., Jr.; Meyer, F.; Reinhold, c.

    2010-01-01

    Solar-wind induced sputtering of the lunar surface includes, in principle, both kinetic and potential sputtering. The role of the latter mechanism, however, in many focused studies has not been properly ascertained due partly to lack of data but can also be attributed to the assertion that the contribution of solar-wind heavy ions to the total sputtering is quite low due to their low number density compared to solar-wind protons. Limited laboratory measurements show marked enhancements in the sputter yields of slow-moving, highly-charged ions impacting oxides. Lunar surface sputtering yields are important as they affect, e.g., estimates of the compositional changes in the lunar surface, its erosion rate, as well as its contribution to the exosphere as well as estimates of hydrogen and water contents. Since the typical range of solar-wind ions at 1 keV/amu is comparable to the thickness of the amorphous rim found on lunar soil grains, i.e. few 10s nm, lunar simulant samples JSC-1A AGGL are specifically enhanced to have such rims in addition to the other known characteristics of the actual lunar soil particles. However, most, if not all laboratory studies of potential sputtering were carried out in single crystal targets, quite different from the rim s amorphous structure. The effect of this structural difference on the extent of potential sputtering has not, to our knowledge, been investigated to date.

  19. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  20. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimat......At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  1. Sputtering and mixing of supported nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física y Química Aplicadas a la Técnica Aeronaútica, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III (Electricidad y Electrónica), Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2013-12-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed.

  2. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  3. Characterization of Hydroxyapatite Film on Titanium Substrate by Sputtering Technique

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Radiofrequent magnetron sputtering technique was used to produce calcium phosphate coated on the titanium substrates, and the sputtered coating films were crystallized in an autoclave at 110 ℃ using a low temperature hydrothermal technique. The crystallization of as- sputtered coating film on the titanium substrates were amorphous calcium phosphate film. However, after the hydrothermal technique, calcium phosphate crystals grew and these were columnar crystal. The Ca/ P ratio of sputtered coating films in 1.6 to 2.0.

  4. Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering,by producing dense secondary plasma around the substrate,provides a high ion current density.The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal,alloy,and ceramic thin films.The key factor in the CFUBMS system is the ability to transport high ion currents to the substrate,which can enhance the formation of full dense coatings at relatively low value homologous temperature.The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes.Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.

  5. Experimental investigation of the energy and temperature dependence of beryllium self sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Korshunov, S.N.; Guseva, M.I.; Stolijarova, V.G. [RRC Kurchatov Institute, Moscow (Russian Federation)

    1995-09-01

    The low-Z metal beryllium is considered as plasma facing material (PFM) for the ITER. It is expected that operation temperature range of beryllium PFM will be (670 - 1070) K. While experimental Be-sputtering data bases exist for H{sup +}, D{sup +} and He{sup +}-ions, the self-sputtering yields of Be have only been estimated by computer simulation. In this paper we report the experimental results on the energy and temperature dependence of the beryllium self-sputtering yield (S). The energy dependence of S{sup s} in the energy range (0.5 - 10.0) keV was measured at 670 K. The self-sputtering yield of Be attains its maximal value at the ion energy of 1.5 keV, being equal to 0.32 {+-} at./ion. Comparison of the experimental results and theoretical prediction shows a good agreement for energy dependence of S{sup s}. The temperature dependence of S{sup s} in the temperature range (370-1070)K was obtained for 0.9keV Be{sup +}-ions. The value of S{sup s} is not changed up to 870 K. It sharply increases at the temperatures above 870 attaining the value of 0.75 at./ion at 1070 K.

  6. Reactive sputtering of TiN films at large substrate to target distances

    Energy Technology Data Exchange (ETDEWEB)

    Musil, J.; Kadlec, S. (Czechosovak Academy of Sciences, Prague (Czechoslovakia). Inst. of Physics)

    1990-01-01

    This paper is a critical review of the present status of the magnetron ion sputter plating of thin CiN films. Thus different possibilities of extracting high ion currents 1{sub s} from the magnetron discharge to substrates located not only at standard target to substrate distances d{sub S-T} of about 50 mm but also at larger distances d{sub S-T} are discussed in detail. Special attention is devoted to magnetron sputtering systems with enhanced ionization, to plasma confinement in the magnetron sputtering systems and to the discharge characteristics of an unbalanced magnetron (UM). It is shown that a UM can be operated in the regime of a double-site-sustained discharge (DSSD) and in this case large 1{sub s} can be extracted to substrates located in large D{sub S-T} of about 200 mm and even at high pressures p = 5 Pa. A physical comparison of the conventional magnetron (CM), UM and DSSD is also given. Considerable attention is also devoted to the effect of ion bombardment on properties of TiN films created in the sputtering system using DSSD. (author).

  7. A review of basic phenomena and techniques for sputter-deposition of high temperature superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))

    1990-01-01

    The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.

  8. A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations

    Science.gov (United States)

    Raman, Priya; Weberski, Justin; Cheng, Matthew; Shchelkanov, Ivan; Ruzic, David N.

    2016-10-01

    High Power Impulse Magnetron Sputtering (HiPIMS) is one of the recent developments in the field of magnetron sputtering technology that is capable of producing high performance, high quality thin films. Commercial implementation of HiPIMS technology has been a huge challenge due to its lower deposition rates compared to direct current Magnetron Sputtering. The cylindrically symmetric "TriPack" magnet pack for a 10 cm sputter magnetron that was developed at the Center for Plasma Material Interactions was able to produce higher deposition rates in HiPIMS compared to conventional pack HiPIMS for the same average power. The "TriPack" magnet pack in HiPIMS produces superior substrate uniformity without the need of substrate rotation in addition to producing higher metal ion fraction to the substrate when compared to the conventional pack HiPIMS [Raman et al., Surf. Coat. Technol. 293, 10 (2016)]. The films that are deposited using the "TriPack" magnet pack have much smaller grains compared to conventional pack DC and HiPIMS films. In this paper, the reasons behind the observed increase in HiPIMS deposition rates from the TriPack magnet pack along with a modified particle flux model is discussed.

  9. Simulation of tungsten sputtering with EDGE2D–EIRENE in low triangularity L-mode JET ITER like wall configuration

    Energy Technology Data Exchange (ETDEWEB)

    Harting, D., E-mail: d.harting@fz-juelich.de [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Groth, M. [Aalto University, Association EURATOM-Tekes, Otakaari 4, 02015 Espoo (Finland); Beurskens, M. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Boerner, P. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Brix, M. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Coenen, J.W. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Corrigan, G. [Culham Science Centre, Association EURATOM-CCFE Fusion, Abingdon, Oxon OX14 3DB (United Kingdom); Lehnen, M. [Institut für Energie- und Klimaforschung – IEK-4, Plasmaphysik, Forschungszentrum Jülich, TEC, Association EURATOM-FZJ, D-52425 Jülich (Germany); Marsen, S. [Max-Planck Institut für Plasmaphysik, Association EURATOM, D-17491 Greifswald (Germany); Rooij, G. van [FOM Institute for Plasma Physics, Rijnhuizen PO Box 1207, 3420BE Nieuwegein (Netherlands); and others

    2013-07-15

    The 2D edge plasma transport code EDGE2D-EIRENE has been upgraded to account for the actual material and geometric properties of the newly installed ITER like wall (ILW) at JET. This includes the simulation of beryllium and tungsten impurities as well as a revised treatment of sputtering by main plasma and impurity atoms and ions (including self sputtering). In this work, two L-mode density regimes, a sheath limited and a high recycling regime, are presented with a power scan from 2 to 6 MW. Tungsten is self consistently simulated with the scrape of layer (SOL) plasma by the EDGE2D–EIRENE code. A detailed analysis of the tungsten sputtering is presented, resolving the individual contributions of the different atomic and ion species in the simulations.

  10. Brightness Alteration with Interweaving Contours

    Directory of Open Access Journals (Sweden)

    Sergio Roncato

    2012-12-01

    Full Text Available Chromatic induction is observed whenever the perceived colour of a target surface shifts towards the hue of a neighbouring surface. Some vivid manifestations may be seen in a white background where thin coloured lines have been drawn (assimilation or when lines of different colours are collinear (neon effect or adjacent (watercolour to each other. This study examines a particular colour induction that manifests in concomitance with an opposite effect of colour saturation (or anti-spread. The two phenomena can be observed when a repetitive pattern is drawn in which outline thin contours intercept wider contours or surfaces, colour spreading appear to fill the surface occupied by surfaces or thick lines whereas the background traversed by thin lines is seen as brighter or filled of a saturated white. These phenomena were first observed by Bozzi (1975 and Kanizsa (1979 in figural conditions that did not allow them to document their conjunction. Here we illustrate various manifestations of this twofold phenomenon and compare its effects with the known effects of brightness and colour induction. Some conjectures on the nature of these effects are discussed.

  11. Bright Star Astrometry with URAT

    CERN Document Server

    Zacharias, Norbert

    2015-01-01

    The U.S. Naval Observatory Robotic Astrometric Telescope (URAT) is observing the northern sky since April 2012 for an astrometric survey. Multiple overlaps per year are performed in a single bandpass (680$-$750 nm) using the "redlens" 20 cm aperture astrograph and a mosaic of large CCDs. Besides the regular, deep survey to magnitude 18.5, short exposures with an objective grating are taken to access stars as bright as 3rd magnitude. A brief overview of the program, observing and reductions is given. Positions on the 8 to 20 mas level are obtained of 66,202 Hipparcos stars at current epochs. These are compared to the Hipparcos Catalog to investigate its accuracy. About 20\\% of the observed Hipparcos stars are found to have inconsitent positions with the Hipparcos Catalog prediction on the 3 sigma level or over (about 75 mas or more discrepant position offsets). Some stars are now seen at an arcsec (or 25 sigma) off their Hipparcos Catalog predicted position.

  12. Brightness and darkness as perceptual dimensions

    NARCIS (Netherlands)

    Vladusich, T.; Lucassen, M.P.; Cornelissen, F.W.

    2007-01-01

    A common-sense assumption concerning visual perception states that brightness and darkness cannot coexist at a given spatial location. One corollary of this assumption is that achromatic colors, or perceived grey shades, are contained in a one-dimensional (1-D) space varying from bright to dark. The

  13. SURFACE PHOTOMETRY OF LOW SURFACE BRIGHTNESS GALAXIES

    NARCIS (Netherlands)

    DEBLOK, WJG; VANDERHULST, JM; BOTHUN, GD

    1995-01-01

    Low surface brightness (LSB) galaxies are galaxies dominated by an exponential disc whose central surface brightness is much fainter than the value of mu(B)(0) = 21.65 +/- 0.30 mag arcsec(-2) found by Freeman. In this paper we present broadband photometry of a sample of 21 late-type LSB galaxies. Th

  14. Galaxy selection and the surface brightness distribution

    CERN Document Server

    McGaugh, S S; Schombert, J M

    1995-01-01

    Optical surveys for galaxies are biased against the inclusion of low surface brightness (LSB) galaxies. Disney (1976) suggested that the constancy of disk central surface brightness noticed by Freeman (1970) was not a physical result, but instead was an artifact of sample selection. Since LSB galaxies do exist, the pertinent and still controversial issue is if these newly discovered galaxies constitute a significant percentage of the general galaxy population. In this paper, we address this issue by determining the space density of galaxies as a function of disk central surface brightness. Using the physically reasonable assumption (which is motivated by the data) that central surface brightness is independent of disk scale length, we arrive at a distribution which is roughly flat (\\ie approximately equal numbers of galaxies at each surface brightness) faintwards of the Freeman (1970) value. Brightwards of this, we find a sharp decline in the distribution which is analogous to the turn down in the luminosity ...

  15. Electron Cyclotron Resonance-Sputtered Nanocarbon Film Electrode Compared with Diamond-Like Carbon and Glassy Carbon Electrodes as Regards Electrochemical Properties and Biomolecule Adsorption

    Science.gov (United States)

    Xue, Qiang; Kato, Dai; Kamata, Tomoyuki; Umemura, Shigeru; Hirono, Shigeru; Niwa, Osamu

    2012-09-01

    The electrochemical properties and biocompatible characteristics at an electron cyclotron resonance (ECR)-sputtered nanocarbon film electrode, a diamond-like carbon (DLC) electrode and a glassy carbon (GC) electrode have been studied. The three carbon electrodes show significant current reductions with increased peak separations as a result of protein fouling before oxygen plasma treatment, but the current reductions of the ECR-sputtered nanocarbon and DLC film electrodes are smaller than that of the GC electrode due to their superior surface flatness. The oxygen plasma pretreated ECR-sputtered nanocarbon film electrode exhibits a significant improvement in anti-fouling performance with an improved electron transfer. This is because the pretreated ECR-sputtered nanocarbon film enabled the surface to introduce surface oxygen functionalities that not only improve the interaction between the analytes and the electrode surface but also make the film surface more hydrophilic, which is important for the suppression of biomolecule adsorption. At the same time, the pretreated ECR-sputtered nanocarbon film also retained an ultraflat surface even after pretreatment as a result of the low background current. This excellent performance can only be achieved with our ECR-sputtered nanocarbon film, indicating that our film is promising for application to electrochemical detectors for various biomolecular analytes.

  16. RF Sputtering of Gold Contacts On Niobium

    Science.gov (United States)

    Barr, D. W.

    1983-01-01

    Reliable gold contacts are deposited on niobium by combination of RF sputtering and photolithography. Process results in structures having gold only where desired for electrical contact. Contacts are stable under repeated cycling from room temperature to 4.2 K and show room-temperature contact resistance as much as 40 percent below indium contacts made by thermalcompression bonding.

  17. Research on Sputtering of Ferroelectric Thin Films

    Science.gov (United States)

    1990-02-01

    and d1,5 coefficients as a function of composition in the PbNb 2 06-BaNb2O6 system. Fig. 4 Schematic representation of the sputter coating process. Fig...and photochromic 2 activities, and promises excellent optoelectronic properties. There have been numerous concepts for its application in elec- tronic

  18. IGM metal enrichment through dust sputtering

    CERN Document Server

    Bianchi, S; Bianchi, Simone; Ferrara, Andrea

    2005-01-01

    We study the motion of dust grains into the Intergalactic Medium (IGM) around redshift z=3, to test the hypothesis that grains can efficiently pollute the gas with metals through sputtering. We use the results available in the literature for radiation-driven dust ejection from galaxies as initial conditions, and follow the motion onward. Via this mechanism, grains are ejected into the IGM with velocities >100 km/s; as they move supersonically, grains can be efficiently eroded by non-thermal sputtering. However, Coulomb and collisional drag forces effectively reduce the charged grain velocity. Up-to-date sputtering yields for graphite and silicate (olivine) grains have been derived using the code TRIM, for which we provide analytic fits. After training our method on a homogeneous density case, we analyze the grain motion and sputtering in the IGM density field as derived from a LambdaCDM cosmological simulation at z = 3.27. We found that only large (a >~ 0.1-um) grains can travel up to considerable distances (...

  19. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.

    1992-01-01

    were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...

  20. Influence of nitrogen admixture to argon on the ion energy distribution in reactive high power pulsed magnetron sputtering of chromium

    Science.gov (United States)

    Breilmann, W.; Maszl, C.; Hecimovic, A.; von Keudell, A.

    2017-04-01

    Reactive high power impulse magnetron sputtering (HiPIMS) of metals is of paramount importance for the deposition of various oxides, nitrides and carbides. The addition of a reactive gas such as nitrogen to an argon HiPIMS plasma with a metal target allows the formation of the corresponding metal nitride on the substrate. The addition of a reactive gas introduces new dynamics into the plasma process, such as hysteresis, target poisoning and the rarefaction of two different plasma gases. We investigate the dynamics for the deposition of chromium nitride by a reactive HiPIMS plasma using energy- and time-resolved ion mass spectrometry, fast camera measurements and temporal and spatially resolved optical emission spectroscopy. It is shown that the addition of nitrogen to the argon plasma gas significantly changes the appearance of the localized ionization zones, the so-called spokes, in HiPIMS plasmas. In addition, a very strong modulation of the metal ion flux within each HiPIMS pulse is observed, with the metal ion flux being strongly suppressed and the nitrogen molecular ion flux being strongly enhanced in the high current phase of the pulse. This behavior is explained by a stronger return effect of the sputtered metal ions in the dense plasma above the racetrack. This is best observed in a pure nitrogen plasma, because the ionization zones are mostly confined, implying a very high local plasma density and consequently also an efficient scattering process.

  1. Fundamental Photoemission Brightness Limit from Disorder Induced Heating

    CERN Document Server

    Maxson, Jared; Coleman-Smith, Christopher; Wan, Weishi; Padmore, Howard

    2013-01-01

    We determine the limit of the highest achievable photoemitted electron brightness, due to heating just after emission into vacuum, applicable to both relativistic and nonrelativistic photoelectron production. This heating is due to poorly screened Coulomb interactions equivalent to disorder induced heating seen in ultracold neutral plasmas. Owing to the multi-scale nature of the initial interactions of such systems, an N-body tree algorithm is used to compute the universal scaling of the disorder induced heating in fully contained bunches, and is shown to agree well with a simple model utilizing the tabulated correlated energy of one component plasmas. We also present simulations for beams undergoing Coulomb explosion at the photocathode, and demonstrate that both the temperature growth and subsequent cooling must be characterized by correlated effects, as well as correlation-frozen dynamics. In either case, the induced temperature is found to be of several meV for typical photoinjector beam densities, a sign...

  2. Characterization of sputtered ZnO films under different sputter-etching time of substrate

    Institute of Scientific and Technical Information of China (English)

    LI Cui-ping; YANG Bao-he; QIAN Li-rong; XU Sheng; DAI Wei; LI Ming-ji; LI Xiao-wei; GAO Cheng-yao

    2011-01-01

    Polycrystalline ZnO films are prepared using radio frequency magnetron sputtering on glass substrates which are sputteretched for different time.Both the size of ZnO grains and the root-mean-square (RMS) roughness decrease,as the sputteretching time of the substrate increases.More Zn atoms are bound to O atoms in the films,and the defect concentration is decreased with increasing sputter-etching time of substrate.Meanwhile,the crystallinity and c-axis orientation are improved at longer sputter-etching time of the substrate.The Raman peaks at 99 cm-1,438 cm-1 and 589 cm-1 are identified as E2(low),E2(high) and E1(LO) modes,respectively,and the position of E1(LO) peak blue shifts at longer sputter-etching time.The transmittances of the films,which are deposited on the substrate and etched for 10 min and 20 min,are higher in the visible region than that of the films deposited under longer sputter-etching time of 30 min.The bandgap increases from 3.23 eV to 3.27 eV with the increase of the sputter-etching time of substrate.

  3. Bright Streaks and Dark Fans

    Science.gov (United States)

    2007-01-01

    The south polar region of Mars is covered every year by a layer of carbon dioxide ice. In a region called the 'cryptic terrain,' the ice is translucent and sunlight can penetrate through the ice to warm the surface below. The ice layer sublimates (evaporates) from the bottom. The dark fans of dust seen in this image come from the surface below the layer of ice, carried to the top by gas venting from below. The translucent ice is 'visible' by virtue of the effect it has on the tone of the surface below, which would otherwise have the same color and reflectivity as the fans. Bright streaks in this image are fresh frost. The CRISM team has identified the composition of these streaks to be carbon dioxide. Observation Geometry Image PSP_003113_0940 was taken by the High Resolution Imaging Science Experiment (HiRISE) camera onboard the Mars Reconnaissance Orbiter spacecraft on 26-Mar-2007. The complete image is centered at -85.8 degrees latitude, 106.0 degrees East longitude. The range to the target site was 244.9 km (153.0 miles). At this distance the image scale is 49.0 cm/pixel (with 2 x 2 binning) so objects 147 cm across are resolved. The image shown here has been map-projected to 50 cm/pixel . The image was taken at a local Mars time of 06:20 PM and the scene is illuminated from the west with a solar incidence angle of 79 degrees, thus the sun was about 11 degrees above the horizon. At a solar longitude of 207.6 degrees, the season on Mars is Northern Autumn.

  4. Bright Sparks of Our Future!

    Science.gov (United States)

    Riordan, Naoimh

    2016-04-01

    My name is Naoimh Riordan and I am the Vice Principal of Rockboro Primary School in Cork City, South of Ireland. I am a full time class primary teacher and I teach 4th class, my students are aged between 9-10 years. My passion for education has developed over the years and grown towards STEM (Science, Technology, Engineering and Mathematics) subjects. I believe these subjects are the way forward for our future. My passion and beliefs are driven by the unique after school programme that I have developed. It is titled "Sparks" coming from the term Bright Sparks. "Sparks" is an after school programme with a difference where the STEM subjects are concentrated on through lessons such as Science, Veterinary Science Computer Animation /Coding, Eco engineering, Robotics, Magical Maths, Chess and Creative Writing. All these subjects are taught through activity based learning and are one-hour long each week for a ten-week term. "Sparks" is fully inclusive and non-selective which gives all students of any level of ability an opportunity to engage into these subjects. "Sparks" is open to all primary students in County Cork. The "Sparks" after school programme is taught by tutors from the different Universities and Colleges in Cork City. It works very well because the tutor brings their knowledge, skills and specialised equipment from their respective universities and in turn the tutor gains invaluable teaching practise, can trial a pilot programme in a chosen STEM subject and gain an insight into what works in the physical classroom.

  5. Current density distributions and sputter marks in electron cyclotron resonance ion sources.

    Science.gov (United States)

    Panitzsch, Lauri; Peleikis, Thies; Böttcher, Stephan; Stalder, Michael; Wimmer-Schweingruber, Robert F

    2013-01-01

    Most electron cyclotron resonance ion sources use hexapolar magnetic fields for the radial confinement of the plasma. The geometry of this magnetic structure is then--induced by charged particles--mapped onto the inner side of the plasma electrode via sputtering and deposition. The resulting structures usually show two different patterns: a sharp triangular one in the central region which in some cases is even sputtered deep into the material (referred to as thin groove or sharp structure), and a blurred but still triangular-like one in the surroundings (referred to as broad halo). Therefore, both patterns seem to have different sources. To investigate their origins we replaced the standard plasma electrode by a custom-built plasma electrode acting as a planar, multi-segment current-detector. For different biased disc voltages, detector positions, and source biases (referred to the detector) we measured the electrical current density distributions in the plane of the plasma electrode. The results show a strong and sharply confined electron population with triangular shape surrounded by less intense and spatially less confined ions. Observed sputter- and deposition marks are related to the analysis of the results. Our measurements suggest that the two different patterns (thin and broad) indeed originate from different particle populations. The thin structures seem to be caused by the hot electron population while the broad marks seem to stem from the medium to highly charged ions. In this paper we present our measurements together with theoretical considerations and substantiate the conclusions drawn above. The validity of these results is also discussed.

  6. Effect of preliminary vacuum plasma treatment on coating adhesion

    Science.gov (United States)

    Slabodchikov, Vladimir A.; Borisov, Dmitry P.; Kuznetsov, Vladimir M.

    2016-11-01

    The paper presents research results on the adhesion properties of Si coatings synthesized by different methods and under different conditions of preliminary vacuum ion plasma treatment of substrates with subsequent magnetron sputtering. The substrate surface was pretreated with low-energy ion beams, high-energy ion beams, gas discharge plasma, and plasma produced by a magnetron sputtering system. The vacuum conditions (pump type, pressure, etc.), the ion current density, and the bias parameters (pulse repetition frequency and duration) were varied. The research results demonstrate a considerable effect of plasma immersion ion implantation on the adhesion of Si coatings to NiTi substrates.

  7. News on sputter theory: Molecular targets, nanoparticle desorption, rough surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.d [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Anders, Christian [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia)

    2011-05-01

    Sputtering theory has existed as a mature and well-understood field of physics since the theory of collision-cascade sputtering has been developed in the late 1960s. In this presentation we outline several directions, in which the basic understanding of sputter phenomena has been challenged and new insight has been obtained recently. Sputtering of molecular solids: after ion impact on a molecular solid, not all of the impact energy is available for inducing sputtering. Part of the energy is converted into internal (rotational and vibrational) excitation of the target molecules, and part is used for molecule dissociation. Furthermore, exothermic or endothermic chemical reactions may further change the energy balance in the irradiated target. Nanoparticle desorption: usually, the flux of sputtered particles is dominated by monatomics; in the case of a pronounced spike contribution to sputtering, the contribution of clusters in the sputtered flux may become considerable. Here, we discuss the situation that nanoparticles were present on the surface, and outline mechanisms of how these may be desorbed (more or less intact) by ion or cluster impact. Rough surfaces: real surfaces are rough and contain surface defects (adatoms, surface steps, etc.). For grazing ion incidence, these influence the energy input into the surface dramatically. For such incidence angles sputtering vanishes for a flat terrace; however, ion impact close to a defect may lead to sputter yields comparable to those at normal incidence. In such cases sputtering also exhibits a pronounced azimuth and temperature dependence.

  8. Ionizing radiation effects on electrical and reliability characteristics of sputtered Ta2O5/Si interface

    Science.gov (United States)

    Rao, Ashwath; Verma, Ankita; Singh, B. R.

    2015-06-01

    This paper describes the effect of ionizing radiation on the interface properties of Al/Ta2O5/Si metal oxide semiconductor (MOS) capacitors using capacitance-voltage (C-V) and current-voltage (I-V) characteristics. The devices were irradiated with X-rays at different doses ranging from 100 rad to 1 Mrad. The leakage behavior, which is an important parameter for memory applications of Al/Ta2O5/Si MOS capacitors, along with interface properties such as effective oxide charges and interface trap density with and without irradiation has been investigated. Lower accumulation capacitance and shift in flat band voltage toward negative value were observed in annealed devices after exposure to radiation. The increase in interfacial oxide layer thickness after irradiation was confirmed by Rutherford Back Scattering measurement. The effect of post-deposition annealing on the electrical behavior of Ta2O5 MOS capacitors was also investigated. Improved electrical and interface properties were obtained for samples deposited in N2 ambient. The density of interface trap states (Dit) at Ta2O5/Si interface sputtered in pure argon ambient was higher compared to samples reactively sputtered in nitrogen-containing plasma. Our results show that reactive sputtering in nitrogen-containing plasma is a promising approach to improve the radiation hardness of Ta2O5/Si MOS devices.

  9. Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

    Directory of Open Access Journals (Sweden)

    Wojcieszak Damian

    2015-09-01

    Full Text Available Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

  10. Space Brightness Evaluation for a Daylit Room

    Directory of Open Access Journals (Sweden)

    Takashi Maruyama

    2011-05-01

    Full Text Available One of the most important problems for lighting design is how to reduce an electric energy. One way to solve this problem is use of daylight, but little is known how to perceive a brightness of a room illuminated by daylight come in through a window and artificial light. Although the horizontal illuminance increases because of daylight, we would not perceive the room as bright as brightness estimated by the illuminance. The purpose of this study is to measure the space brightness for daylit room and to propose a evaluation method. The experiment was conducted with a couple of miniature office rooms, standard room and test room. Test room has several types of windows and standard room has no window. Subject was asked to evaluate the brightness of the test room relative to the standard room with method of magnitude estimation. It was found that brightness of daylit room did not increase simply with horizontal illuminance. Subject perceived a daylit room darker than a room illuminated only by the artificial light even if horizontal illuminance of these room was same. The effect of daylight on space brightness would vary with the window size and intensity of daylight or artificial light.

  11. The Physics and Applications of High Brightness Electron Beams

    Science.gov (United States)

    Palumbo, Luigi; Rosenzweig, J.; Serafini, Luca

    2007-09-01

    Plenary sessions. RF deflector based sub-Ps beam diagnostics: application to FEL and advanced accelerators / D. Alesini. Production of fermtosecond pulses and micron beam spots for high brightness electron beam applications / S.G. Anderson ... [et al.]. Wakefields of sub-picosecond electron bunches / K.L.F. Bane. Diamond secondary emitter / I. Ben-Zvi ... [et al.]. Parametric optimization for an X-ray free electron laser with a laser wiggler / R. Bonifacio, N. Piovella and M.M. Cola. Needle cathodes for high-brightness beams / C.H. Boulware ... [et al.]. Non linear evolution of short pulses in FEL cascaded undulators and the FEL harmonic cascade / L. Giannessi and P. Musumeci. High brightness laser induced multi-meV electron/proton sources / D. Giulietti ... [et al.]. Emittance limitation of a conditioned beam in a strong focusing FEL undulator / Z. Huang, G. Stupakov and S. Reiche. Scaled models: space-charge dominated electron storage rings / R.A. Kishek ... [et al.]. High brightness beam applications: energy recovered linacs / G.A. Krafft. Maximizing brightness in photoinjectors / C. Limborg-Deprey and H. Tomizawa. Ultracold electron sources / O.J. Luiten ... [et al.]. Scaling laws of structure-based optical accelerators / A. Mizrahi, V. Karagodsky and L. Schächter. High brightness beams-applications to free-electron lasers / S. Reiche. Conception of photo-injectors for the CTF3 experiment / R. Roux. Superconducting RF photoinjectors: an overview / J. Sekutowicz. Status and perspectives of photo injector developments for high brightness beams / F. Stephan. Results from the UCLA/FNLP underdense plasma lens experiment / M.C. Thompson ... [et al.]. Medical application of multi-beam compton scattering monochromatic tunable hard X-ray source / M. Uesaka ... [et al.]. Design of a 2 kA, 30 fs RF-photoinjector for waterbag compression / S.B. Van Der Geer, O.J. Luiten and M.J. De Loos. Proposal for a high-brightness pulsed electron source / M. Zolotorev ... [et al

  12. Predicted emittance and brightness of the pseudospark electron-beam

    Energy Technology Data Exchange (ETDEWEB)

    Pitchford, L.C. [Univ. Paul Sabatier, Toulouse (France). Centre de Physique Atomique

    1995-06-01

    The emittance /and brightness of the electron beam generated during the hollow cathode phase of pseudospark operation are calculated using the two-dimensional hybrid fluid-particle model previously developed to study the time and space development of the plasma in a pseudospark discharge. Two distinct energy components exist in the electron beam; a high-energy component with an energy equivalent to the full discharge voltage and another, broad, low-energy component. In the 100 ns following breakdown and for the conditions of the calculations, the emittance of the high energy component decreases by an order of magnitude and the brightness of the high energy component reaches almost 10{sup 10} A/m{sup 2} rad{sub 2}. This work demonstrates the feasibility of using the model to guide the optimization of the pseudospark electron beam properties and shows that the optimum beam properties are achieved after the plasma has filled the hollow cathode and begun to expand radially in the main gap.

  13. Sputtering of the Europa surface by thermal ions from the torus and pickup ions in a diverted flow

    Science.gov (United States)

    Dols, Vincent J.; Cassidy, Timothy A.; Bagenal, Fran; Crary, Frank; Delamere, Peter A.

    2016-10-01

    Europa's atmosphere is very tenuous and is mainly composed of O2. It is thought to be produced by ion bombardment of its icy surface. Several ion populations may contribute to this sputtering:1) The thermal plasma of the torus (~ 1keV including ram velocity), which may be partially diverted around the moon by the ionospheric currents2) The energetic sulfur and hydrogen ions (~10 keV-MeV), which diffuse inward toward Europa's orbit3) and possibly the newly ionized O2 molecules that are picked up by the torus flow and hit the surface.The relative contribution of each sputtering ion population has been debated for more than three decades with estimated O2 sputtering rates varying by ~2 order of magnitude. Modelers have historically focused on a single piece of the puzzle: plasma modelers assume a static atmosphere and tend not to check that their sources and losses are consistent with their prescribed atmosphere; while atmospheric modelers neglect the electro-dynamic interaction that diverts torus plasma around the moon, and limits the ion flux to the surface.In this work, we present a first step to compute self-consistently the atmospheric production by the bombardment of the thermal plasma and pickup O2+ ions.1) We calculate the plasma flow around Europa with a MHD model2) We use this flow in a multi-species physical chemistry model of the plasma-atmosphere interaction to compute the ion fluxes into Europa's surface.3) We compute the production rate of O2 resulting from the ice sputtering by thermal and pickup ions and compare the resulting atmospheric source rate to previously published results.

  14. Bright boys the making of information technology

    CERN Document Server

    Green, Tom

    2010-01-01

    Everything has a beginning. None was more profound-and quite as unexpected-than Information Technology. Here for the first time is the untold story of how our new age came to be and the bright boys who made it happen. What began on the bare floor of an old laundry building eventually grew to rival in size the Manhattan Project. The unexpected consequence of that journey was huge---what we now know as Information Technology. For sixty years the bright boys have been totally anonymous while their achievements have become a way of life for all of us. "Bright Boys" brings them home. By 1950 they'd

  15. Improved adherence of sputtered titanium carbide coatings on nickel- and titanium-base alloys

    Science.gov (United States)

    Wheeler, D. R.; Brainard, W. A.

    1979-01-01

    Rene 41 and Ti-6Al-4V alloys were radio frequency sputter coated with titanium carbide by several techniques in order to determine the most effective. Coatings were evaluated in pin-on-disk tests. Surface analysis by X-ray photoelectron spectroscopy was used to relate adherence to interfacial chemistry. For Rene 41, good coating adherence was obtained when a small amount of acetylene was added to the sputtering plasma. The acetylene carburized the alloy surface and resulted in better bonding to the TiC coating. For Ti-6Al-4V, the best adherence and wear protection was obtained when a pure titanium interlayer was used between the coating and the alloy. The interlayer is thought to prevent the formation of a brittle, fracture-prone, aluminum oxide layer.

  16. Sputtered iridium oxide films (SIROFs) for low-impedance neural stimulation and recording electrodes.

    Science.gov (United States)

    Cogan, S F; Plante, T D; Ehrlich, J

    2004-01-01

    Iridium oxide films formed by electrochemical activation of iridium metal (AIROF) or by electrochemical deposition (EIROF) are being evaluated as low-impedance charge-injection coatings for neural stimulation and recording. Iridium oxide may also be deposited by reactive sputtering from iridium metal in an oxidizing plasma. The characterization of sputtered iridium oxide films (SIROFs) as coatings for nerve electrodes is reported. SIROFs were characterized by cyclic voltammetry, electrochemical impedance spectroscopy, and potential transient measurements during charge-injection. The surface morphology of the SIROF transitions from smooth to highly nodular with increasing film thickness from 80 nm to 4600 nm. Charge-injection capacities exceed 0.75 mC/cm(2) with 0.75 ms current pulses in thicker films. The SIROF was deposited on both planar and non-planar substrates and photolithographically patterned by lift-off.

  17. Magnetron sputtering of copper on thermosensitive polymer materials of the gas centrifuge rotors

    Science.gov (United States)

    Borisevich, V.; Senchenkov, S.; Titov, D.

    2016-09-01

    Magnetron sputtering is the well-known and widely-used deposition technique for coating versatile high-quality and well-adhered films. However, the technology has some limitations, caused by high temperatures on the coating surface. The paper is devoted to the experimental development of a process of magnetron sputtering of copper on a surface coated with a thermosensitive polymer made of carbon fiber with epoxide binder. This process is applied for balancing a rotor of a gas centrifuge for isotope separation. The optimum operating parameters of the process are found and discussed. They were in quantitative agreement with data obtained by means of non-stationary modeling based on a global description of plasma in the typical geometry of the magnetron discharges obtained in independent research. The structure of the resulting layer is investigated.

  18. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Zhuo Shiyi; Xiong Yuying; Gu Min

    2009-01-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn0.99Cu0.01 O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  19. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Zhuo Shiyi; Xiong Yuying; Gu Min, E-mail: xiongyy@scnu.edu.c [Laboratory of Quantum Information Technology, School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510006 (China)

    2009-05-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn{sub 0.99}Cu{sub 0.01}O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1+. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  20. Brightness of synchrotron radiation from wigglers

    CERN Document Server

    Geloni, Gianluca; Saldin, Evgeni

    2014-01-01

    According to literature, while calculating the brightness of synchrotron radiation from wigglers, one needs to account for the so called `depth-of-field' effects. In fact, the particle beam cross section varies along the wiggler. It is usually stated that the effective photon source size increases accordingly, while the brightness is reduced. Here we claim that this is a misconception originating from an analysis of the wiggler source based on geometrical arguments, regarded as almost self-evident. According to electrodynamics, depth-of-field effects do not exist: we demonstrate this statement both theoretically and numerically, using a well-known first-principle computer code. This fact shows that under the usually accepted approximations, the description of the wiggler brightness turns out to be inconsistent even qualitatively. Therefore, there is a need for a well-defined procedure for computing the brightness from a wiggler source. We accomplish this task based on the use of a Wigner function formalism. I...

  1. Charge ordering in reactive sputtered (1 0 0) and (1 1 1) oriented epitaxial Fe3O4 films

    KAUST Repository

    Mi, Wenbo

    2013-06-01

    Epitaxial Fe3O4 films with (1 0 0) and (1 1 1) orientations fabricated by reactive sputtering present simultaneous magnetic and electrical transitions at 120 and 124 K, respectively. The symmetry decreases from face-centered cubic to monoclinic structure across the Verwey transition. Extra spots with different brightness at different positions appear in selected-area diffraction patterns at 95 K. The extra spots come from the charge ordering of outer-layer electrons of Fe atoms, and should be related to the charge ordering of octahedral B-site Fe atoms. © 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  2. The analogy between stereo depth and brightness.

    Science.gov (United States)

    Brookes, A; Stevens, K A

    1989-01-01

    Apparent depth in stereograms exhibits various simultaneous-contrast and induction effects analogous to those reported in the luminance domain. This behavior suggests that stereo depth, like brightness, is reconstructed, ie recovered from higher-order spatial derivatives or differences of the original signal. The extent to which depth is analogous to brightness is examined. There are similarities in terms of contrast effects but dissimilarities in terms of the lateral inhibition effects traditionally attributed to underlying spatial-differentiation operators.

  3. Assessment of the effects of scrape-off layer fluctuations on first wall sputtering with the TOKAM-2D turbulence code

    Science.gov (United States)

    Marandet, Y.; Nace, N.; Valentinuzzi, M.; Tamain, P.; Bufferand, H.; Ciraolo, G.; Genesio, P.; Mellet, N.

    2016-11-01

    Plasma material interactions on the first wall of future tokamaks such as ITER and DEMO are likely to play an important role, because of turbulent radial transport. The latter results to a large extent from the radial propagation of plasma filaments through a tenuous background. In such a situation, mean field descriptions (on which transport codes rely) become questionable. First wall sputtering is of particular interest, especially in a full W machine, since it has been shown experimentally that first wall sources control core contamination. In ITER, beryllium sources will be one of the important actors in determining the fuel retention level through codeposition. In this work, we study the effect of turbulent fluctuations on mean sputtering yields and fluxes, relying on a new version of the TOKAM-2D code which includes ion temperature fluctuations. We show that fluctuations enhance sputtering at sub-threshold impact energies, by more than an order of magnitude when fluctuation levels are of order unity.

  4. The sputter cross section of a surface-vacancy island

    Energy Technology Data Exchange (ETDEWEB)

    Rosandi, Yudi, E-mail: rosandi@physik.uni-kl.de [Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Fachbereich Physik und Forschungszentrum OPTIMAS, Universitaet Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany)

    2011-07-15

    Using molecular-dynamics simulation we investigate the effect of surface-vacancy islands on ion-induced sputtering. As an exemplary case, the sputtering of a Pt(1 1 1) surface by 5 keV Ar{sup +} ions incident at 83{sup o} towards the surface normal is investigated. We find that only the ascending step of the island induces sputtering. Wide vacancy islands exhibit the direct-hit, indirect-hit and channeling zones previously identified for surface steps and adatom islands. A special role is played by the descending step edge. Even though it is not sputtered itself, it deflects ion trajectories and may direct them to the ascending step edge thus enhancing sputtering. We derive a simple criterion based on the shadow cone of the descending step to decide whether a vacancy island contributes to sputtering or not.

  5. GaAs Films Prepared by RF-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  6. SPUTTERING FROM A POROUS MATERIAL BY PENETRATING IONS

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez-Nieva, J. F. [Instituto Balseiro, Universidad Nacional de Cuyo, 8400 Bariloche (Argentina); Bringa, E. M. [CONICET and Instituto de Ciencias Basicas, Universidad Nacional de Cuyo, 5500 Mendoza (Argentina); Cassidy, T. A. [CalTech/JPL, Pasadena, CA 91109 (United States); Johnson, R. E.; Fama, M.; Baragiola, R. A. [Laboratory for Atomic and Surface Physics, University of Virginia, Charlottesville, VA 22903 (United States); Caro, A. [Los Alamos National Laboratory, Los Alamos, NM 94551 (United States); Loeffler, M. J. [NASA Goddard Space Flight Center, Astrochemistry Branch, Code 691, Greenbelt, MD 20771 (United States); Farkas, D. [Department of Materials Sciences, Virginia Tech, Blacksburg, VA 24061 (United States)

    2011-12-10

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  7. Sputtering from a Porous Material by Penetrating Ions

    Science.gov (United States)

    Rodriguez-Nieva, J. F.; Bringa, E. M.; Cassidy, T. A.; Johnson, R. E.; Caro, A.; Fama, M.; Loeffler, M. J.; Baragiola, R. A.; Farkas, D.

    2011-12-01

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  8. Fluidized Bed Sputtering for Particle and Powder Metallization

    Science.gov (United States)

    2013-04-01

    Fluidized Bed Sputtering for Particle and Powder Metallization by Daniel M. Baechle, J. Derek Demaree, James K. Hirvonen, and Eric D...5069 ARL-TR-6435 April 2013 Fluidized Bed Sputtering for Particle and Powder Metallization Daniel M. Baechle, J. Derek Demaree, James K...YYYY) April 2013 2. REPORT TYPE Final 3. DATES COVERED (From - To) June 2008–June 2012 4. TITLE AND SUBTITLE Fluidized Bed Sputtering for

  9. Simulation and experimental study on compositional evolution of Li-Co in LiCoO2 thin films during sputter deposition

    Science.gov (United States)

    Nimisha, C. S.; Mohan Rao, G.

    2011-06-01

    The compositional evolution in sputter deposited LiCoO2 thin films is influenced by process parameters involved during deposition. The electrochemical performance of these films strongly depends on their microstructure, preferential orientation and stoichiometry. The transport process of sputtered Li and Co atoms from the LiCoO2 target to the substrate, through Ar plasma in a planar magnetron configuration, was investigated based on the Monte Carlo technique. The effect of sputtering gas pressure and the substrate-target distance (dst) on Li/Co ratio, as well as, energy and angular distribution of sputtered atoms on the substrate were examined. Stable Li/Co ratios have been obtained at 5 Pa pressure and dst in the range 5-11 cm. The kinetic energy and incident angular distribution of Li and Co atoms reaching the substrate have been found to be dependent on sputtering pressure. Simulations were extended to predict compositional variations in films prepared at various process conditions. These results were compared with the composition of films determined experimentally using x-ray photoelectron spectroscopy (XPS). Li/Co ratio calculated using XPS was in moderate agreement with that of the simulated value. The measured film thickness followed the same trend as predicted by simulation. These studies are shown to be useful in understanding the complexities in multicomponent sputtering.

  10. Materials Analysis of Transient Plasma-Wall Interactions

    Science.gov (United States)

    2014-05-13

    model showing the importance sputter and re-deposition. plasma, pulsed plasma, directed energy, transient wall interaction, high energy density...each equipped with a 25kV copper- vapor thyratron start switch capable of sub-microsecond triggering resolution. Each start switch is paired with a...sample exposure positions within the plasma jet. The probe utilizes a PCB Piezotronics model 113B21 pressure sensor modified to work in the plasma jet

  11. Crescimento de filmes finos cristalinos de dióxido de titânio por sistemas magnetron sputtering.

    OpenAIRE

    Diego Alexandre Duarte

    2010-01-01

    Nesse trabalho é reportado o crescimento de filmes finos de dióxido de titânio (TiO2) por duas técnicas assistidas a plasma chamadas magnetron sputtering convencional (MSC) e magnetron sputtering catodo oco (MSCO). O dióxido de titânio foi crescido sobre substratos de silício, variando alguns parâmetros de plasma como, por exemplo, a distância axial (z0) e a concentração de oxigênio na mistura Ar+O2. As amostras foram caracterizadas por perfilometria, microscopia de força atômica (MFA) e difr...

  12. Modeling and stability analysis of the nonlinear reactive sputtering process

    Directory of Open Access Journals (Sweden)

    György Katalin

    2011-12-01

    Full Text Available The model of the reactive sputtering process has been determined from the dynamic equilibrium of the reactive gas inside the chamber and the dynamic equilibrium of the sputtered metal atoms which form the compound with the reactive gas atoms on the surface of the substrate. The analytically obtained dynamical model is a system of nonlinear differential equations which can result in a histeresis-type input/output nonlinearity. The reactive sputtering process has been simulated by integrating these differential equations. Linearization has been applied for classical analysis of the sputtering process and control system design.

  13. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  14. Lifetime dependence of nitrided carbon stripper foils on sputter angle during N{sup +} ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sugai, I., E-mail: isao.Sugai@kek.jp [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Oyaizu, M. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Takeda, Y. [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawakami, H. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawasaki, K.; Hattori, T. [Department of Physics, Tokyo Institute of Technology, Ohokayama, Meguro, Tokyo 152-8550 (Japan); Kadono, T. [Department of Physics, University of Tokyo, Hongo, 7-3-1, Bunkyo, Tokyo 113-0033 (Japan)

    2015-09-01

    We fabricated high-lifetime thin nitride carbon stripper (NCS) foils with high nitrogen contents using ion-beam sputtering with reactive nitrogen gas and investigated the dependence of their lifetimes on the sputter angle. The nitrogen in carbon foils plays a critical role in determining their lifetime. Therefore, in order to investigate the effects of the nitrogen level in NCS foils on foil lifetime, we measured the sputtering yield for different sputter angles at a sputtering voltage of 10 kV while using carbon-based targets. We also measured the nitrogen-to-carbon thickness ratios of the foils using Rutherford backscattering spectrometry. The foils made at a sputter angle of 15° using a glassy amorphous carbon target exhibited an average increase of 200-fold in lifetime when compared to commercially available foils.

  15. Simulation of tungsten sputtering with EDGE2D–EIRENE in low triangularity L-mode JET ITER like wall configuration

    NARCIS (Netherlands)

    Harting, D.; Groth, M.; Beurskens, M.; Boerner, P.; Brix, M.; Coenen, J. W.; Corrigan, G.; Lehnen, M.; Marsen, S.; van Rooij, G. J.; Reiter, D.; Wiesen, S.

    2013-01-01

    The 2D edge plasma transport code EDGE2D-EIRENE has been upgraded to account for the actual material and geometric properties of the newly installed İTER\\} like wall (ILW) at JET. This includes the simulation of beryllium and tungsten impurities as well as a revised treatment of sputtering by main p

  16. Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/a-C : H nanocomposite films

    NARCIS (Netherlands)

    Shaha, K.P.; Pei, Y.T.; Martinez-Martinez, D.; Sanchez-Lopez, J.C.; Hosson, J.Th.M. De

    2010-01-01

    Mechanical, structural, chemical bonding (sp(3)/sp(2)). and tribological properties of films deposited by pulsed-DC sputtering of Ti targets in Ar/C2H2 plasma were studied as a function of the substrate bias voltage, Ti-target current, C2H2 flow rate and pulse frequency by nanoindentation, Raman spe

  17. The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

    Institute of Scientific and Technical Information of China (English)

    王庆; 王永富; 巴德纯; 岳向吉

    2012-01-01

    The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.

  18. Reactive magnetron sputter deposition of superconducting niobium titanium nitride thin films with different target sizes

    CERN Document Server

    Bos, B G C; Haalebos, E A F; Gimbel, P M L; Klapwijk, T M; Baselmans, J J A; Endo, A

    2016-01-01

    The superconducting critical temperature (Tc>15 K) of niobium titanium nitride (NbTiN) thin films allows for low-loss circuits up to 1.1 THz, enabling on-chip spectroscopy and multi-pixel imaging with advanced detectors. The drive for large scale detector microchips is demanding NbTiN films with uniform properties over an increasingly larger area. This article provides an experimental comparison between two reactive d.c. sputter systems with different target sizes: a small target (100 mm diameter) system and a large target (127 mm x 444.5 mm) one, with the aim of improving the film uniformity using the large target system. We focus on the Tc of the films and I-V characteristics of the sputter plasma, and we find that both systems are capable of depositing films with Tc>15 K. We find that these films are deposited within the transition from metallic to compound sputtering, at the point where target nitridation most strongly depends on nitrogen flow. Key in the deposition optimization is to increase the system'...

  19. Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?

    Science.gov (United States)

    Strijckmans, K.; Moens, F.; Depla, D.

    2017-02-01

    This paper discusses a few mechanisms that can assist to answer the title question. The initial approach is to use an established model for DC magnetron sputter deposition, i.e., RSD2013. Based on this model, the impact on the hysteresis behaviour of some typical HiPIMS conditions is investigated. From this first study, it becomes clear that the probability to observe hysteresis is much lower as compared to DC magnetron sputtering. The high current pulses cannot explain the hysteresis reduction. Total pressure and material choice make the abrupt changes less pronounced, but the implantation of ionized metal atoms that return to the target seems to be the major cause. To further substantiate these results, the analytical reactive sputtering model is coupled with a published global plasma model. The effect of metal ion implantation is confirmed. Another suggested mechanism, i.e., gas rarefaction, can be ruled out to explain the hysteresis reduction. But perhaps the major conclusion is that at present, there are too little experimental data available to make fully sound conclusions.

  20. Physical processes in directed ion beam sputtering. Ph.D. Thesis

    Science.gov (United States)

    Robinson, R. S.

    1979-01-01

    The general operation of a discharge chamber for the production of ions is described. A model is presented for the magnetic containment of both primary and secondary or Maxwellian electrons in the discharge plasma. Cross sections were calculated for energy and momentum transfer in binary collisions between like pairs of Ar, Kr, and Xe atoms in the energy range from about 1 eV to 1000 eV. These calculations were made from available pair interaction potentials using a classical model. Experimental data from the literature were fit to a theoretical expression for the Ar resonance charge exchange cross section over the same energy range. A model was developed that describes the processes of conical texturing of a surface due to simultaneous directed ion beam etching and sputter deposition of an impurity material. This model accurately predicts both a minimum temperature for texturing to take place and the variation of cone density with temperature. It also provides the correct order of magnitude of cone separation. It was predicted from the model, and subsequently verified experimentally, that a high sputter yield material could serve as a seed for coning of a lower sputter yield substrate. Seeding geometries and seed deposition rates were studied to obtain an important input to the theoretical texturing model.

  1. Modeling the Europa plasma torus

    Science.gov (United States)

    Schreier, Ron; Eviatar, Aharon; Vasyliunas, Vytenis M.; Richardson, John D.

    1993-12-01

    The existence of a torus of plasma generated by sputtering from Jupiter's satellite Europa has long been suspected but never yet convincingly demonstrated. Temperature profiles from Voyager plasma observations indicate the presence of hot, possibly freshly picked-up ions in the general vicinity of the orbit of Europa, which may be interpreted as evidence for a local plasma torus. Studies of ion partitioning in the outer regions of the Io torus reveal that the oxygen to sulfur mixing ratio varies with radial distance; this may indicates that oxygen-rich matter is injected from a non-Io source, most probably Europa. We have constructed a quantitative model of a plasma torus near the orbit of Europa which takes into account plasma input from the Io torus, sputtering from the surface of Europa, a great number of ionization and charge exchange processes, and plasma loss by diffusive transport. When the transport time is chosen so that the model's total number density in consistent with the observed total plasma density, the contribution from Europa is found to be significant although not dominant. The model predicts in detail the ion composition, charge states, and the relative fractions of hot Europa-generated and (presumed) cold Io-generated ions. The results are generally consistent with observations from Voyager and can in principle (subject to limitations of data coverage) be confirmed in more detail by Ulysses.

  2. Silica-sandwiched Au nanoparticle arrays by a soft PE-CVD/RF sputtering approach

    Energy Technology Data Exchange (ETDEWEB)

    Barreca, Davide [ISTM-CNR and INSTM, Department of Chemistry, Padova University, Via Marzolo, 1-35131 Padova (Italy); Gasparotto, Alberto; Maccato, Chiara; Tondello, Eugenio [Department of Chemistry, Padova University and INSTM, Via Marzolo, 1-35131 Padova (Italy)], E-mail: alberto.gasparotto@unipd.it

    2008-06-25

    This work is focused on the development of an innovative synthetic route to SiO{sub 2}-sandwiched Au nanoparticle arrays. The adopted strategy consists of: (i) the radio frequency sputtering of gold on thermally oxidized Si(100) and silica substrates from Ar plasmas; (ii) the plasma enhanced chemical vapor deposition of a SiO{sub 2} overlayer using tetramethoxysilane as precursor from Ar-O{sub 2} plasmas. A common feature of both preparative stages is the use of very soft processing conditions at temperatures close to room temperature, in order to tailor the Au nanoparticle morphology and to preserve it upon SiO{sub 2} coverage. In situ monitoring of gold deposition was accomplished by means of laser reflection interferometry. Valuable information on the system morphology before and after SiO{sub 2} coverage was provided by field emission-scanning electron microscopy for samples with different Au content. Additional important information on the system chemical composition, structure and optical response was gained by the combined use of x-ray photoelectron spectroscopy, glancing incidence x-ray diffraction and UV-visible absorption spectroscopy. The results obtained highlight the formation of high-purity SiO{sub 2}/Au/SiO{sub 2}-sandwiched stacks, in which the gold content and distribution, as well as the nanoparticle morphology, could be tailored by the sole variation of the sputtering time, without any further ex situ treatment.

  3. Bright stars observed by FIMS/SPEAR

    CERN Document Server

    Jo, Young-Soo; Min, Kyoung-Wook; Choi, Yeon-Ju; Lim, Tae-Ho; Lim, Yeo-Myeong; Edelstein, Jerry; Han, Wonyong

    2015-01-01

    In this paper, we present a catalogue of the spectra of bright stars observed during the sky survey using the Far-Ultraviolet Imaging Spectrograph (FIMS), which was designed primarily to observe diffuse emissions. By carefully eliminating the contamination from the diffuse background, we obtain the spectra of 70 bright stars observed for the first time with a spectral resolution of 2--3 {\\AA} over the wavelength of 1370--1710 {\\AA}. The far-ultraviolet spectra of an additional 139 stars are also extracted with a better spectral resolution and/or higher reliability than those of the previous observations. The stellar spectral type of the stars presented in the catalogue spans from O9 to A3. The method of spectral extraction of the bright stars is validated by comparing the spectra of 323 stars with those of the International Ultraviolet Explorer (IUE) observations.

  4. Brightness discrimination in budgerigars (Melopsittacus undulatus.

    Directory of Open Access Journals (Sweden)

    Olle Lind

    Full Text Available Birds have excellent spatial acuity and colour vision compared to other vertebrates while spatial contrast sensitivity is relatively poor for unknown reasons. Contrast sensitivity describes the detection of gratings of varying spatial frequency. It is unclear whether bird brightness discrimination between large uniform fields is poor as well. Here we show that budgerigars (Melopsittacus undulatus need a Michelson contrast of 0.09 to discriminate between large spatially separated achromatic fields in bright light conditions. This is similar to the peak contrast sensitivity of 10.2 (0.098 Michelson contrast for achromatic grating stimuli established in earlier studies. The brightness discrimination threshold described in Weber fractions is 0.18, which is modest compared to other vertebrates.

  5. Increasing the brightness of light sources

    Energy Technology Data Exchange (ETDEWEB)

    Fu, Ling

    2006-11-16

    In this work the principle of light recycling is applied to artificial light sources in order to achieve brightness enhancement. Firstly, the feasibilities of increasing the brightness of light sources via light recycling are examined theoretically, based on the fundamental laws of thermodynamics including Kirchhoff's law on radiation, Planck's law, Lambert-Beer's law, the etendue conservation and the brightness theorem. From an experimental viewpoint, the radiation properties of three different kinds of light sources including short-arc lamps, incandescent lamps and LEDs characterized by their light-generating mechanisms are investigated. These three types of sources are used in light recycling experiments, for the purpose of 1. validating the intrinsic light recycling effect in light sources, e. g. the intrinsic light recycling effect in incandescent lamps stemming from the coiled filament structure. 2. acquiring the required parameters for establishing physical models, e.g. the emissivity/absorptivity of the short-arc lamps, the intrinsic reflectivity and the external quantum efficiency of LEDs. 3. laying the foundations for designing optics aimed at brightness enhancement according to the characteristics of the sources and applications. Based on the fundamental laws and experiments, two physical models for simulating the radiance distribution of light sources are established, one for thermal filament lamps, the other for luminescent sources, LEDs. As validation of the theoretical and experimental investigation of the light recycling effect, an optical device, the Carambola, is designed for achieving deterministic and multiple light recycling. The Carambola has the function of a concentrator. In order to achieve the maximum possible brightness enhancement with the Carambola, several combinations of sources and Carambolas are modelled in ray-tracing simulations. Sources with different light-emitting mechanisms and different radiation properties

  6. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber: The influence of substrate bias

    OpenAIRE

    Bui, X. L.; Pei, Y.T.; De Hosson, J. Th. M.

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si wafer were about the same. Columnar structures resulting from a rough interface were often observed in the coatings deposited on rubbers. Only at a high bias voltage of -300 V the coating on HNBR ...

  7. Microwave properties of RF- sputtered ZnFe{sub 2}O{sub 4} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Garg, T., E-mail: gargphy@iitb.ac.in; Kulkarni, A. R.; Venkataramani, N. [Department of Metallurgical Engineering and Materials Science, IIT Bombay, Mumbai-400076 (India); Sahu, B. N.; Prasad, Shiva [Department of Physics, IIT Bombay, Mumbai-400076 (India)

    2014-04-24

    In this work, RF- magnetron sputtering technique has been employed to deposit nanocrystalline ZnFe{sub 2}O{sub 4} thin films at room temperature. The as grown films were ex-situ annealed in air for 2 h at temperatures from 150°C to 650°C. X-ray diffraction, vibrating sample magnetometer and ferromagnetic resonance were used to analyze the phase formation, magnetic properties and microwave properties respectively. From the hysteresis loops and ferromagnetic resonance spectra taken at room temperature, a systematic study on the effect of O{sub 2} plasma on microwave properties with respect to processing temperature has been carried out.

  8. Ground state atomic oxygen in high-power impulse magnetron sputtering: a quantitative study

    Science.gov (United States)

    Britun, Nikolay; Belosludtsev, Alexandr; Silva, Tiago; Snyders, Rony

    2017-02-01

    The ground state density of oxygen atoms in reactive high-power impulse magnetron sputtering discharges has been studied quantitatively. Both time-resolved and space-resolved measurements were conducted. The measurements were performed using two-photon absorption laser-induced fluorescence (TALIF), and calibrated by optical emission actinometry with multiple Ar emission lines. The results clarify the dynamics of the O ground state atoms in the discharge afterglow significantly, including their propagation and fast decay after the plasma pulse, as well as the influence of gas pressure, O2 admixture, etc.

  9. The historical investigation of cometary brightness

    Science.gov (United States)

    Hughes, David W.

    1998-12-01

    The interpretation of the way in which the brightness of a comet varied as a function of both its heliocentric and geocentric distance was essentially started by Isaac Newton in his book Philosophiae Naturalis Principia Mathematica, published in 1687. Astronomers have argued about the form of this variability ever since, and for many years it was regarded as an important clue as to the physical nature of the cometary nucleus and its decay process. This paper reviews our understanding of the causes of cometary brightness variability between about 1680 and the 1950s.

  10. RADIOASTRON OBSERVATIONS OF THE QUASAR 3C273: A CHALLENGE TO THE BRIGHTNESS TEMPERATURE LIMIT

    Energy Technology Data Exchange (ETDEWEB)

    Kovalev, Y. Y.; Kardashev, N. S.; Voitsik, P. A.; Kovalev, Yu. A.; Lisakov, M. M.; Sokolovsky, K. V. [Astro Space Center of Lebedev Physical Institute, Profsoyuznaya 84/32, 117997 Moscow (Russian Federation); Kellermann, K. I. [National Radio Astronomy Observatory, 520 Edgemont Road, Charlottesville, VA 22903-2475 (United States); Lobanov, A. P.; Zensus, J. A.; Anderson, J. M.; Bach, U.; Kraus, A. [Max-Planck-Institute for Radio Astronomy, Auf dem Hügel 69, D-53121 (Germany); Johnson, M. D. [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States); Gurvits, L. I. [Joint Institute for VLBI ERIC, P.O. Box 2, 7990 AA Dwingeloo (Netherlands); Jauncey, D. L. [CSIRO Astronomy and Space Sciences, Epping, NSW 1710 (Australia); Ghigo, F. [National Radio Astronomy Observatory, Rt. 28/92, Green Bank, WV 24944-0002 (United States); Ghosh, T.; Salter, C. J. [Arecibo Observatory, NAIC, HC3 Box 53995, Arecibo, Puerto Rico, PR 00612 (United States); Petrov, L. Yu. [Astrogeo Center, 7312 Sportsman Drive, Falls Church, VA 22043 (United States); Romney, J. D. [National Radio Astronomy Observatory, P.O. Box O, 1003 Lopezville Road, Socorro, NM 87801-0387 (United States)

    2016-03-20

    Inverse Compton cooling limits the brightness temperature of the radiating plasma to a maximum of 10{sup 11.5} K. Relativistic boosting can increase its observed value, but apparent brightness temperatures much in excess of 10{sup 13} K are inaccessible using ground-based very long baseline interferometry (VLBI) at any wavelength. We present observations of the quasar 3C 273, made with the space VLBI mission RadioAstron on baselines up to 171,000 km, which directly reveal the presence of angular structure as small as 26 μas (2.7 light months) and brightness temperature in excess of 10{sup 13} K. These measurements challenge our understanding of the non-thermal continuum emission in the vicinity of supermassive black holes and require a much higher Doppler factor than what is determined from jet apparent kinematics.

  11. Origin of the energetic ion beams at the substrate generated during high power pulsed magnetron sputtering of titanium

    CERN Document Server

    Maszl, Christian; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    High power pulsed magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these energetic ions in HiPIMS is still an open issue, which is unraveled by using three fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\\mu$s, phase resolved optical emission spectroscopy with 1 $\\mu$s and the rotating shutter experiment with a resolution of 50 $\\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^+$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^{+}$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, ...

  12. Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

    Energy Technology Data Exchange (ETDEWEB)

    Stranak, V., E-mail: stranak@physik.uni-greifswald.de [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Wulff, H. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Rebl, H. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Zietz, C. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Arndt, K. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Bogdanowicz, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Nebe, B. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Bader, R. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Podbielski, A. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Hubicka, Z. [Academy of Sciences of the Czech Republic, Institute of Physics, Na Slovance 2, 180 00 Prague (Czech Republic); Hippler, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany)

    2011-10-10

    The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within the first 24 h the amount of Cu released from dual-HiPIMS films (about 250 {mu}g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated the killing of both bacteria using the Ti-Cu films prepared using the dual-HiPIMS technique. The killing effects on biofilm bacteria were less obvious. After the total release of copper from the Ti-Cu film the vitality of exposed human osteoblast MG-63 cells increased significantly. An initial cytotoxic effect followed by the growth of osteoblastic cells was demonstrated. The cytotoxic effect combined with growth of osteoblastic cells could be used in joint replacement surgery to reduce the possibility of infection and to increase adoption of the implants. Highlights: {yields} Ti-Cu films with significant cytotoxic effect were prepared by dual-HiPIMS technique. {yields} The cytotoxic effect is caused by total release of copper species from thin films. {yields} The copper release is influenced by crystallography and chemical properties of thin films. {yields} Sufficient growth of osteoblastic cells follows after copper release.

  13. Large area plasma source

    Science.gov (United States)

    Foster, John (Inventor); Patterson, Michael (Inventor)

    2008-01-01

    An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.

  14. Coating metals on micropowders by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Magnetron sputtering was used to coat various metals on micropowder surfaces. By using this method, the fine particles are better dispersed and can therefore be coated more homogeneously. The micro-powders used include cenospheres from fly ash of coal-burning electric power plants (diameter 40-200 μm and particle density 0.7±0.1 g/cm3), as well as carborundum particles of different sizes. Aluminum, silver, copper, cobalt and nickel were used as the coating metals. Tests showed that the coated metal film was compact adhering tightly on the base powders, and the coated powders possess adequate flow properties.

  15. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.;

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  16. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.;

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  17. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen;

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...

  18. Growth of brass nanofilms sputtered on organic substrate

    Institute of Scientific and Technical Information of China (English)

    CHEN Zhen-xing; WANG Ling-sen; HUANG Bai-yun

    2005-01-01

    The growth of brass nanofilms sputtered on acrylics substrate was studied through experimental investigation of the effect of sputtering voltage, target-to-substrate distance, chamber pressure and sputtering time on the content, growth rate and surface morphology of brass nanofilms. The results show that compared with original brass target, Cu content in brass nanofilms changes by no more than 6.23% (mass fraction). High sputtering voltage and short target-to-substrate distance help to improve brass nanofilm deposition rate. There exists an optimal chamber pressure where deposition rate of nanofilm reaches the maximum. The key factor affecting surface morphology is the kinetic energy of sputtering particles. Low sputtering voltage, large target-to-substrate distance and low chamber pressure are very important for the formation of the high-quality brass nanofilms. The brass films prepared under the conditions of sputtering voltage 1.6 kV, target-to-substrate distance 2.5 cm, chamber pressure 10 Pa and sputtering time 20 min, possess following characteristics: smooth and uniform surface, thickness of 41 nm and Cu content of 71.0% (mass fraction).

  19. Sputtering of the most volatile solids: The solid hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Ellegaard, O.

    1995-01-01

    Electronic sputtering of the three stable hydrogenic solids, H-2, HD and D-2 by keV hydrogen and deuterium ions has been studied at the low-temperature setup at Riso. The yield of the sputtered particles has been determined for hydrogenic films of thicknesses ranging from 0.1 X 10(18) up to 10 X ...

  20. Brightness of synchrotron radiation from wigglers

    Science.gov (United States)

    Geloni, Gianluca; Kocharyan, Vitali; Saldin, Evgeni

    2016-01-01

    According to the literature, while calculating the brightness of synchrotron radiation from wigglers, one needs to account for the so-called 'depth-of-field' effects. In fact, the particle beam cross-section varies along the wiggler. It is usually stated that the effective photon source size increases accordingly, while the brightness is reduced. Here we claim that this is a misconception originating from an analysis of the wiggler source based on geometrical arguments, regarded as almost self-evident. According to electrodynamics, depth-of-field effects do not exist: we demonstrate this statement both theoretically and numerically, using a well-known first-principle computer code. This fact shows that under the usually accepted approximations, the description of the wiggler brightness turns out to be inconsistent even qualitatively. Therefore, there is a need for a well-defined procedure for computing the brightness from a wiggler source. We accomplish this task based on the use of a Wigner function formalism. We exemplify this formalism in simple limiting cases. We consider the problem of the calculation of the wiggler source size by means of numerical simulations alone, which play the same role of an experiment. We report a significant numerical disagreement between exact calculations and approximations currently used in the literature.

  1. Bright Future for Petroleum Development Cooperation

    Institute of Scientific and Technical Information of China (English)

    Zhang Zhenqing

    1996-01-01

    @@ China's oil prospects look bright, since reform and opening speed up. The oil production of 1995 is 148 million tons and the confirmed reserves of oil and gas only occupy one-fifth of those possible to be verified, the petroleum exploration will be deepened to locate and confirm the remaining reserves.

  2. Dark Matter in Low Surface Brightness Galaxies

    NARCIS (Netherlands)

    Blok, W. J. G. de; McGaugh, S. S.

    1996-01-01

    Abstract: Low Surface Brightness (LSB) galaxies form a large population of disc galaxies that extend the Hubble sequence towards extreme late-types. They are only slowly evolving, and still in an early evolutionary state. The Tully-Fisher relation and rotation curves of LSB galaxies both show that L

  3. Dark matter in low surface brightness galaxies

    NARCIS (Netherlands)

    de Blok, WJG; McGaugh, SS; Persic, M; Salucci, P

    1997-01-01

    Low Surface Brightness (LSB) galaxies form a large population of disc galaxies that extend the Hubble sequence towards extreme late-types. They are only slowly evolving, and still in an early evolutionary state. The Tully-Fisher relation and rotation curves of LSB galaxies both show that LSB galaxie

  4. A photometric investigation of a bright Geminid

    NARCIS (Netherlands)

    Degewij, J.; Diggelen, Johannes van

    1968-01-01

    Photographic observations of meteors in the Netherlands started with a bright Geminid of photographic magnitude −8 observed on December 11, 1955, 21h39m55s by M. Alberts. From the assumed radiant and velocity we have constructed the trajectory of the bolide. The luminosity of the trail has been dete

  5. Alberta Associations for Bright Children Members' Handbook.

    Science.gov (United States)

    Alberta Association for Bright Children, Edmonton.

    This handbook is designed to provide information to parents of gifted children in Alberta, Canada. The handbook outlines the mission and objectives of the Alberta Associations for Bright Children and describes the structure of the non-profit organization. The booklet then addresses: (1) the characteristics of gifted children; (2) the rights of…

  6. Brightness and darkness as perceptual dimensions.

    Directory of Open Access Journals (Sweden)

    Tony Vladusich

    2007-10-01

    Full Text Available A common-sense assumption concerning visual perception states that brightness and darkness cannot coexist at a given spatial location. One corollary of this assumption is that achromatic colors, or perceived grey shades, are contained in a one-dimensional (1-D space varying from bright to dark. The results of many previous psychophysical studies suggest, by contrast, that achromatic colors are represented as points in a color space composed of two or more perceptual dimensions. The nature of these perceptual dimensions, however, presently remains unclear. Here we provide direct evidence that brightness and darkness form the dimensions of a two-dimensional (2-D achromatic color space. This color space may play a role in the representation of object surfaces viewed against natural backgrounds, which simultaneously induce both brightness and darkness signals. Our 2-D model generalizes to the chromatic dimensions of color perception, indicating that redness and greenness (blueness and yellowness also form perceptual dimensions. Collectively, these findings suggest that human color space is composed of six dimensions, rather than the conventional three.

  7. Probable Bright Supernova discovered by PSST

    Science.gov (United States)

    Smith, K. W.; Wright, D.; Smartt, S. J.; Young, D. R.; Huber, M.; Chambers, K. C.; Flewelling, H.; Willman, M.; Primak, N.; Schultz, A.; Gibson, B.; Magnier, E.; Waters, C.; Tonry, J.; Wainscoat, R. J.; Foley, R. J.; Jha, S. W.; Rest, A.; Scolnic, D.

    2016-09-01

    A bright transient, which is a probable supernova, has been discovered as part of the Pan-STARRS Survey for Transients (PSST). Information on all objects discovered by the Pan-STARRS Survey for Transients is available at http://star.pst.qub.ac.uk/ps1threepi/ (see Huber et al. ATel #7153).

  8. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions

    Science.gov (United States)

    Vašina, P; Hytková, T; Eliáš, M

    2009-05-01

    The majority of current models of the reactive magnetron sputtering assume a uniform shape of the discharge current density and the same temperature near the target and the substrate. However, in the real experimental set-up, the presence of the magnetic field causes high density plasma to form in front of the cathode in the shape of a toroid. Consequently, the discharge current density is laterally non-uniform. In addition to this, the heating of the background gas by sputtered particles, which is usually referred to as the gas rarefaction, plays an important role. This paper presents an extended model of the reactive magnetron sputtering that assumes the non-uniform discharge current density and which accommodates the gas rarefaction effect. It is devoted mainly to the study of the behaviour of the reactive sputtering rather that to the prediction of the coating properties. Outputs of this model are compared with those that assume uniform discharge current density and uniform temperature profile in the deposition chamber. Particular attention is paid to the modelling of the radial variation of the target composition near transitions from the metallic to the compound mode and vice versa. A study of the target utilization in the metallic and compound mode is performed for two different discharge current density profiles corresponding to typical two pole and multipole magnetics available on the market now. Different shapes of the discharge current density were tested. Finally, hysteresis curves are plotted for various temperature conditions in the reactor.

  9. Droplet-free high-density metal ion source for plasma immersion ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Nakamura, Keiji [Department of Electrical Engineering, College of Engineering, Chubu University, 1200 Matsumoto, Kasugai, Aichi 487-8501 (Japan)]. E-mail: nakamura@solan.chubu.ac.jp; Yoshinaga, Hiroaki [Department of Electrical Engineering, Doshisha University, 1-3 Tatara Miyakodani, Kyotanabe, Kyoto 610-0321 (Japan); Yukimura, Ken [Department of Electrical Engineering, Doshisha University, 1-3 Tatara Miyakodani, Kyotanabe, Kyoto 610-0321 (Japan)

    2006-01-15

    This paper reports on plasma parameters and ion composition of droplet-free Zr ion source for plasma immersion ion implantation and deposition (PIII and D). Zirconium (Zr) ions were obtained by ionizing sputtered Zr atoms in inductively-coupled argon discharge. The characteristics of plasma density, plasma potential and electron temperature were typical ones of such a inductive discharge, and the plasma parameters were not significantly influenced by mixing the sputtered Zr atoms into the plasma. Actually, the main ionic component was still Ar{sup +} ions, and the ion density ratio of [Zr{sup +}]/[Ar{sup +}] was as low as {approx}8%. Increase in sputtering rate of the Zr source will be necessary to improve the ion density ratio.

  10. Monte Carlo simulations of nanoscale focused neon ion beam sputtering.

    Science.gov (United States)

    Timilsina, Rajendra; Rack, Philip D

    2013-12-13

    A Monte Carlo simulation is developed to model the physical sputtering of aluminum and tungsten emulating nanoscale focused helium and neon ion beam etching from the gas field ion microscope. Neon beams with different beam energies (0.5-30 keV) and a constant beam diameter (Gaussian with full-width-at-half-maximum of 1 nm) were simulated to elucidate the nanostructure evolution during the physical sputtering of nanoscale high aspect ratio features. The aspect ratio and sputter yield vary with the ion species and beam energy for a constant beam diameter and are related to the distribution of the nuclear energy loss. Neon ions have a larger sputter yield than the helium ions due to their larger mass and consequently larger nuclear energy loss relative to helium. Quantitative information such as the sputtering yields, the energy-dependent aspect ratios and resolution-limiting effects are discussed.

  11. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Lili [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China); Xu, Xue [Rice Research Institute, Anhui Academy of Agricultural Sciences, Nongke South Road 40, Hefei 230031 (China); Wu, Yuejin, E-mail: yjwu@ipp.ac.cn [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China)

    2013-08-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N{sup +} and Ar{sup +} ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models.

  12. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    Science.gov (United States)

    Zhang, Lili; Xu, Xue; Wu, Yuejin

    2013-08-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N+ and Ar+ ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models.

  13. On the formation of Ganymede's surface brightness asymmetries: Kinetic simulations of Ganymede's magnetosphere

    Science.gov (United States)

    Fatemi, S.; Poppe, A. R.; Khurana, K. K.; Holmström, M.; Delory, G. T.

    2016-05-01

    Ganymede possesses strong surface brightness asymmetries both between its polar cap and equatorial regions and between its leading and trailing hemispheres. Here we test the hypothesis that these asymmetries are due to differential Jovian plasma and energetic particle precipitation to the surface with the combination of a hybrid plasma model (kinetic ions and fluid electrons) and a particle tracing model. We describe the hybrid model, the first of its kind applied to Ganymede, and compare the results to both Galileo observations and previous MHD and MHD-EPIC models of Ganymede. We calculate spatially resolved precipitating Jovian ion fluxes to the surface of Ganymede for energies 1 particle fluxes are the primary driver for altering the surface brightness of Ganymede.

  14. A Compact High-Brightness Heavy-Ion Injector

    CERN Document Server

    Westenskow, Glen; Grote, D P; Halaxa, Erni; Kwan, Joe W

    2005-01-01

    To provide compact high-brightness heavy-ion beams for Heavy Ion Fusion (HIF) accelerators, we have been experimenting with merging multi-beamlets in an injector which uses an RF plasma source. In an 80-kV 20-microsecond experiment, the RF plasma source has produced up to 5 mA of Ar+ in a single beamlet. An extraction current density of 100 mA/cm2 was achieved, and the thermal temperature of the ions was below 1 eV. More than 90% of the ions were in the Ar+ state, and the energy spread from charge exchange was found to be small. We have tested at full voltage gradient the first 4 gaps of a 61-beamlet injector design. Einzel lens were used to focus the beamlets while reducing the beamlet to beamlet space charge interaction. We will report on a converging 119 multi-beamlet source. Although the source has the same optics as a full 1.6 MV injector system, the test will be carried out at 400 kV due to the test stand HV limit. We will measure the beam’s emittance after the beamlets are merged and have bee...

  15. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    Energy Technology Data Exchange (ETDEWEB)

    Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  16. Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement

    Institute of Scientific and Technical Information of China (English)

    QI Xuelian; REN Chunsheng; MA Tengcai; WANG Younian

    2008-01-01

    Metallic copper(Cu) films were deposited on a Si (100) substrate by unbalanced magnetron sputtering enhanced by radio-frequency plasma and external magnetic field confine-ment. The morphology and structure of the films were examined by scanning electron microscopy (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD). The surface average rough-ness of the deposited Cu films was characterized by AFM data and resistivity was measured by a four-point probe. The results show that the Cu films deposited with radio-frequency discharge enhanced ionization and external magnetic field confinement have a smooth surface, low surface roughness and low resistivity. The reasons may be that the radio-frequency discharge and external magnetic field enhance the plasma density, which further improves the ion bombardment effect under the same bias voltage conditions. Ion bombardment can obviously influence the growth features and characteristics of the deposited Cu films.

  17. The bright optical flash from GRB 060117

    CERN Document Server

    Jel'inek, M; Kubánek, P; Hudec, R; Nekola, M; Grygar, J; Castro-Tirado, A J; Gorosabel, J; Hrabovsk'y, M; Mandat, D; Nosek, D; Palatka, M; Pandey, S B; Pech, M; Schovanek, P; De Postigo, A U; Vítek, S; Jel\\'inek, Martin; Prouza, Michael; Kub\\'anek, Petr; Hudec, Ren\\'e; Nekola, Martin; R}\\'idk\\'y, Jan {; Grygar, Ji{r}\\'i; Castro-Tirado, Alberto J.; Gorosabel, Javier; Hrabovsk\\'y, Miroslav; Mand\\'at, Du{s}an; Nosek, Dalibor; Palatka, Miroslav; Pandey, Shashi B.; Pech, Miroslav; Schov\\'anek, Petr; S}m\\'ida, Radom\\'ir {; Postigo, Antonio de Ugarte; V\\'itek, Stanislav

    2006-01-01

    We present a discovery and observation of an extraordinarily bright prompt optical emission of the GRB 060117 obtained by a wide-field camera atop the robotic telescope FRAM of the Pierre Auger Observatory from 2 to 10 minutes after the GRB. We found rapid average temporal flux decay of alpha = -1.7 +- 0.1 and a peak brightness R = 10.1 mag. Later observations by other instruments set a strong limit on the optical and radio transient fluxes, unveiling an unexpectedly rapid further decay. We present an interpretation featuring a relatively steep electron-distribution parameter p ~ 3.0 and providing a straightforward solution for the overall fast decay of this optical transient as a transition between reverse and forward shock.

  18. Emittance measurement of high-brightness microbeams

    Energy Technology Data Exchange (ETDEWEB)

    Ishizuka, Hiroshi; Nakahara, Yuriko (Fukuoka Inst. of Tech. (Japan)); Kawasaki, Sunao; Musyoki, S.; Shimizu, Hiroshi; Watanabe, Akihiko; Shiho, Makoto

    1994-09-01

    Arrays of microtriodes have recently become available due to the development of microfabricated field-emission electron sources. Computer simulation has shown that the brightness of beams emitted by them is significantly higher than that of the common microbeams, and possible application of the accelerated beam to free electron lasers has been discussed. Experimentation on beam generation has started, but methods for diagnosing the beam have not yet been established. Difficulty is predicted, because of the high brightness, in applying the conventional methods of emittance measurement. In this paper we propose a new method that determines the emittance without using apertures. The cross section of a converging beam is elongated by a quadrupole lens, and parameters of the emittance ellipse are obtained from the beam size on a screen when changing either the strength or the axial position of the quadrupole lens. (author).

  19. Transport Phenomena of Off-Axis Sputtering Deposition

    Science.gov (United States)

    Zhu, S.; Su, C. H.; Lehoczky, S. L.; Zhang, S.; Whitaker, Ann F. (Technical Monitor)

    2001-01-01

    Various high quality epitaxial films, especially oxides, have been synthesized using off-axis sputtering deposition. In this presentation, we report the experiment results of ZnO films grown by the off-axis sputtering deposition. Films were synthesized in temperatures ranged from room temperature to 600 C, and pressures from 5 mTorr to 150 mTorr. Film growth rate was measured by surface profilometer, ellipsometer, and wavelength dispersive spectrometry. Due to the collisions between the sputtered species and the residue gases, the kinetic energy of species was reduced and the transport of depositing species changed from a ballistic movement for low pressure to a diffuse drift for high pressure in which the transport species were almost thermalized. The measurements show an increase of growth rates along the gravity vector when the Knodson (Knudsen??) number of transport species is less than 0.05, which suggests that gravity affected the transport characterization in off-axis sputtering deposition. Because the product of pressure (p) and travel distance (d) of sputtered species, p exceeds several mTorr-cm during film deposition, the classical simulations for sputtering process in high vacuum system may not be applied. Based on these experimental measurements, a transport process of the off-axis sputtering deposition is proposed. Several methods including the Monte Carlo method and gravity-driven flow dynamics simulation will be discussed.

  20. Modular Zero Energy. BrightBuilt Home

    Energy Technology Data Exchange (ETDEWEB)

    Aldrich, Robb [Steven Winter Associates, Inc., Norwalk, CT (United States); Butterfield, Karla [Steven Winter Associates, Inc., Norwalk, CT (United States)

    2016-03-01

    With funding from the Building America Program, part of the U.S. Department of Energy Building Technologies Office, the Consortium for Advanced Residential Buildings (CARB) worked with BrightBuilt Home (BBH) to evaluate and optimize building systems. CARB’s work focused on a home built by Black Bros. Builders in Lincolnville, Maine (International Energy Conservation Code Climate Zone 6). As with most BBH projects to date, modular boxes were built by Keiser Homes in Oxford, Maine.

  1. Extreme Ultraviolet Explorer Bright Source List

    Science.gov (United States)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  2. Radio-frequency magnetron triode sputtering of cadmium telluride and zinc telluride films and solar cells

    Science.gov (United States)

    Sanford, Adam Lee

    The n-CdS/p-CdTe solar cell has been researched for many years now. Research groups use a variety of processes to fabricate thin-film CdS/CdTe cells, including physical vapor deposition, chemical vapor deposition, and RF diode sputtering. One of the central areas of investigation concerning CdS/CdTe cells is the problem of a Schottky barrier at the back contact. Even cells fabricated with ohmic back contacts degrade into Schottky barriers as the devices are used. This severely degrades power generation. One possible solution is to use p+-ZnTe as an interlayer between CdTe and the back contact. ZnTe is easily doped with Cu to be p-type. However, even contacts with this ZnTe interlayer degrade over time, because Cu is highly mobile and diffuses away from the contact towards the CdS/CdTe junction. Another possibility is to dope ZnTe with N. It has been demonstrated using molecular beam epitaxy and RF diode sputtering. In this study, CdTe films are fabricated using a variation of RF diode sputtering called triode sputtering. This technique allows for control of ion bombardment to the substrate during deposition. Also, a higher plasma density near the target is achieved allowing depositions at lower pressures. These films are characterized structurally to show the effects of the various deposition parameters. N-doped ZnTe films are also fabricated using this technique. These films are characterized electrically to show the effects of the various deposition parameters. Also, the effects of post-deposition annealing are observed. It is found that annealing at the right temperature can increase the conductivity of the films by a factor of 3 or more. However, annealing at higher temperatures decreases the conductivity to as low as 12% of the initial conductivity. Finally, RF triode sputtered N-doped ZnTe films are used as an interlayer at the back contact of a CdS/CdTe solar cell. The effects of annealing the device before and after contact deposition are observed

  3. Method to control deposition rate instabilities—High power impulse magnetron sputtering deposition of TiO{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Kossoy, Anna, E-mail: annaeden@hi.is, E-mail: anna.kossoy@gmail.com; Magnusson, Rögnvaldur L.; Tryggvason, Tryggvi K.; Leosson, Kristjan; Olafsson, Sveinn [Physics Division, Science Institute—University of Iceland, Reykjavik 107 (Iceland)

    2015-03-15

    The authors describe how changes in shutter state (open/closed) affect sputter plasma conditions and stability of the deposition rate of Ti and TiO{sub 2} films. The films were grown by high power impulse magnetron sputtering in pure Ar and in Ar/O{sub 2} mixture from a metallic Ti target. The shutter state was found to have an effect on the pulse waveform for both pure Ar and reactive sputtering of Ti also affecting stability of TiO{sub 2} deposition rate. When the shutter opened, the shape of pulse current changed from rectangular to peak-plateau and pulse energy decreased. The authors attribute it to the change in plasma impedance and gas rarefaction originating in geometry change in front of the magnetron. TiO{sub 2} deposition rate was initially found to be high, 1.45 Å/s, and then dropped by ∼40% during the first 5 min, while for Ti the change was less obvious. Instability of deposition rate poses significant challenge for growing multilayer heterostructures. In this work, the authors suggest a way to overcome this by monitoring the integrated average energy involved in the deposition process. It is possible to calibrate and control the film thickness by monitoring the integrated pulse energy and end growth when desired integrated pulse energy level has been reached.

  4. Energy flux to substrate in high-power impulse magnetron sputtering measured by using optical low-coherence interferometry

    Science.gov (United States)

    Hattori, Katsuhiro; Ohta, Takayuki; Oda, Akinori; Kousaka, Hiroyuki; Ito, Masafumi

    2016-09-01

    The substrate during the plasma irradiation is heated by charged species, neutral species, and the heat radiation and the substrate temperature is determined by energy flux to the substrate. High-power impulse magnetron sputtering (HiPIMS) using short-pulse high-voltage promotes the ionization of sputtered atoms and realizes high density plasma. In this study, we measured the silicon substrate temperature with non-contact type substrate temperature measurement method using optical low-coherence interferometry(LCI) and elucidated the heating mechanisms of the substrate temperature in HiPIMS. The target material was Ti and the distance between the substrate and the target was 60mm. Ar is used as the sputtering gas. The pulse width was from 50 to 300 µsec, the pulse frequency was from 100 to 500Hz. Applied voltages were changed to be from -400V to -900V. Measurement accuracy of contact-type thermocouples and that of noncontact-type LCI were within 2 degree C and 0.7 degree C, respectively. The heat influx to the substrate was calculated from the temporal variation of substrate temperature base on the energy balance equation and increased with increasing applied voltage. The emission intensity of Ti ion increased with increasing applied voltage even though that of Ti atom was constant. These results suggested that main contribution of substrate heating is Ti ion bombardment.

  5. On the origin of facular brightness

    CERN Document Server

    Kostik, R

    2016-01-01

    This paper studies the dependence of the CaIIH line core brightness on the strength and inclination of photospheric magnetic field, and on the parameters of convective and wave motions in a facular region at the solar disc center. We use three simultaneous datasets obtained at the German Vacuum Tower Telescope (Observatorio del Teide, Tenerife): (1) spectra of BaII 4554 A line registered with the instrument TESOS to measure the variations of intensity and velocity through the photosphere up to the temperature minimum; (2) spectropolarimetric data in FeI 1.56 $\\mu$m lines (registered with the instrument TIP II) to measure photospheric magnetic fields; (3) filtergrams in CaIIH that give information about brightness fluctuations in the chromosphere. The results show that the CaIIH brightness in the facula strongly depends on the power of waves with periods in the 5-min range, that propagate upwards, and also on the phase shift between velocity oscillations at the bottom photosphere and around the temperature min...

  6. The Bright SHARC Survey The Cluster Catalog

    CERN Document Server

    Romer, A K; Holden, B P; Ulmer, M P; Pildis, R A; Merrelli, A J; Adami, C; Burke, D J; Collins, C A; Metevier, A J; Kron, Richard G; Commons, K

    1999-01-01

    We present the Bright SHARC (Serendipitous High-Redshift Archival ROSAT Cluster) Survey, which is an objective search for serendipitously detected extended X-ray sources in 460 deep ROSAT PSPC pointings. The Bright SHARC Survey covers an area of 178.6 sq.deg and has yielded 374 extended sources. We discuss the X-ray data reduction, the candidate selection and present results from our on-going optical follow-up campaign. The optical follow-up concentrates on the brightest 94 of the 374 extended sources and is now 97% complete. We have identified thirty-seven clusters of galaxies, for which we present redshifts and luminosities. The clusters span a redshift range of 0.0696Bright SHARC clusters have not been listed in any previously ...

  7. Brightness illusion in the guppy (Poecilia reticulata).

    Science.gov (United States)

    Agrillo, Christian; Miletto Petrazzini, Maria Elena; Bisazza, Angelo

    2016-02-01

    A long-standing debate surrounds the issue of whether human and nonhuman species share similar perceptual mechanisms. One experimental strategy to compare visual perception of vertebrates consists in assessing how animals react in the presence of visual illusions. To date, this methodological approach has been widely used with mammals and birds, while few studies have been reported in distantly related species, such as fish. In the present study we investigated whether fish perceive the brightness illusion, a well-known illusion occurring when 2 objects, identical in physical features, appear to be different in brightness. Twelve guppies (Poecilia reticulata) were initially trained to discriminate which rectangle was darker or lighter between 2 otherwise identical rectangles. Three different conditions were set up: neutral condition between rectangle and background (same background used for both darker and lighter rectangle); congruent condition (darker rectangle in a darker background and lighter rectangle in a lighter background); and incongruent condition (darker rectangle in a lighter background and lighter rectangle in a darker background). After reaching the learning criterion, guppies were presented with the illusory pattern: 2 identical rectangles inserted in 2 different backgrounds. Guppies previously trained to select the darker rectangle showed a significant choice of the rectangle that appears to be darker by human observers (and vice versa). The human-like performance exhibited in the presence of the illusory pattern suggests the existence of similar perceptual mechanisms between humans and fish to elaborate the brightness of objects.

  8. Intrinsic stress analysis of sputtered carbon film

    Institute of Scientific and Technical Information of China (English)

    Liqin Liu; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Moyan Tan; Qiushi Huang; Rui Chen; Jing Xu; Lingyan Chen

    2008-01-01

    Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated.The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses.The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition.By varying argon pressure and target-substrate distance,energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level.The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.

  9. Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering.

    Science.gov (United States)

    Diwan, Anubhav; Singh, Bhupinder; Roychowdhury, Tuhin; Yan, DanDan; Tedone, Laura; Nesterenko, Pavel N; Paull, Brett; Sevy, Eric T; Shellie, Robert A; Kaykhaii, Massoud; Linford, Matthew R

    2016-02-01

    We describe a new process for preparing porous solid phase microextraction (SPME) coatings by the sputtering of silicon onto silica fibers. The microstructure of these coatings is a function of the substrate geometry and mean free path of the silicon atoms, and the coating thickness is controlled by the sputtering time. Sputtered silicon structures on silica fibers were treated with piranha solution (a mixture of concd H2SO4 and 30% H2O2) to increase the concentration of silanol groups on their surfaces, and the nanostructures were silanized with octadecyldimethylmethoxysilane in the gas phase. The attachment of this hydrophobic ligand was confirmed by X-ray photoelectron spectroscopy and contact angle goniometry on model, planar silicon substrates. Sputtered silicon coatings adhered strongly to their surfaces, as they were able to pass the Scotch tape adhesion test. The extraction time and temperature for headspace extraction of mixtures of alkanes and alcohols on the sputtered fibers were optimized (5 min and 40 °C), and the extraction performances of SPME fibers with 1.0 or 2.0 μm of sputtered silicon were compared to those from a commercial 7 μm poly(dimethylsiloxane) (PDMS) fiber. For mixtures of alcohols, aldehydes, amines, and esters, the 2.0 μm sputtered silicon fiber yielded signals that were 3-9, 3-5, 2.5-4.5, and 1.5-2 times higher, respectively, than those of the commercial fiber. For the heavier alkanes (undecane-hexadecane), the 2.0 μm sputtered fiber yielded signals that were approximately 1.0-1.5 times higher than the commercial fiber. The sputtered fibers extracted low molecular weight analytes that were not detectable with the commercial fiber. The selectivity of the sputtered fibers appears to favor analytes that have both a hydrophobic component and hydrogen-bonding capabilities. No detectable carryover between runs was noted for the sputtered fibers. The repeatability (RSD%) for a fiber (n = 3) was less than 10% for all analytes tested

  10. Lattice dynamics during electronic sputtering of solid Ne

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1997-01-01

    Electronic sputtering of solid neon has been studied with molecular dynamics. The cavity formation around an excited atom and particle migration in the surface region, as well as the sputtering process have been studied. A single atomic exciton has been observed to produce a desorption of up...... to five excited or ground state atoms. The ejection from the surface is induced by excitons formed in five outermost monolayers of the solid. Energy and angular distributions of sputtered excited and ground state atoms have been calculated and are compared with experimental data....

  11. New oxygen radical source using selective sputtering of oxygen atoms for high rate deposition of TiO{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Yasuda, Yoji; Lei, Hao; Hoshi, Yoichi [Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan); State Key Laboratory for Corrosion and Protection, Surface Engineering of Materials Division, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 (China); Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan)

    2012-11-15

    We have developed a new oxygen radical source based on the reactive sputtering phenomena of a titanium target for high rate deposition of TiO{sub 2} films. In this oxygen radical source, oxygen radicals are mainly produced by two mechanisms: selective sputter-emission of oxygen atoms from the target surface covered with a titanium oxide layer, and production of high-density oxygen plasma in the space near the magnetron-sputtering cathode. Compared with molecular oxygen ions, the amount of atomic oxygen radicals increased significantly with an increase in discharge current so that atomic oxygen radicals were mainly produced by this radical source. It should be noted that oxygen atoms were selectively sputtered from the target surface, and titanium atoms sputter-emitted from the target cathode were negligibly small. The amount of oxygen radicals supplied from this radical source increased linearly with increasing discharge current, and oxygen radicals of 1 Multiplication-Sign 10{sup 15} atoms/s/cm{sup 2} were supplied to the substrate surface at a discharge current of 1.2 A. We conclude that our newly developed oxygen radical source can be a good tool to achieve high rate deposition and to control the structure of TiO{sub 2} films for many industrial design applications.

  12. Estimation of the space density of low surface brightness galaxies

    NARCIS (Netherlands)

    Briggs, FH

    1997-01-01

    The space density of low surface brightness and tiny gas-rich dwarf galaxies are estimated for two recent catalogs: the Arecibo Survey of Northern Dwarf and Low Surface Brightness Galaxies and the Catalog of Low Surface Brightness Galaxies, List II. The goals are (1) to evaluate the additions to the

  13. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  14. Investigation of kinetics model of dc reactive sputtering

    Institute of Scientific and Technical Information of China (English)

    朱圣龙; 王福会; 吴维叓

    1996-01-01

    A novel physical sputtering kinetics model for reactive sputtering is presented.Reactive gas gettering effects and interactions among the characteristic parameters have been taken into account in the model.The data derived from the model accorded fairly well with experimental results.The relationship between the values of initial oxide coverage on the target and the ready states was depicted in the model.This relationship gives reasons for the difference of the threshold of reactive gas fluxes (Q) from the metal sputtering region to the oxide sputtering region and in reverse direction.The discontinuities in oxide coverage on the target surface (θ) versus reactive gas fluxes (Q) are referred to as the effects of reactive gas partial pressure (p) upon the forming rates of oxide on the surfaces of target (V0).The diversity of the oxygen flux threshold results from the variance of the initial values of oxide coverage on target.

  15. Sputtering System for QWR Cavity in BRIF Project

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    <正>1 Introduction Four superconducting QWR cavities will be used in HI-13 tandem accelerator upgrade project (BRIF). These niobium coated cavities will be produced by CIAE. Up to now, a niobium sputtering

  16. Sputter-Resistant Materials for Electric Propulsion Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using electric...

  17. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Metya, Amaresh; Ghose, Debabrata, E-mail: debabrata.ghose@saha.ac.in; Ray, Nihar Ranjan

    2014-02-28

    The hydrophilic mica surface can be made hydrophobic by low energy Ar{sup +} ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  18. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Science.gov (United States)

    Metya, Amaresh; Ghose, Debabrata; Ray, Nihar Ranjan

    2014-02-01

    The hydrophilic mica surface can be made hydrophobic by low energy Ar+ ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  19. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen;

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 eV, ......V, nonlinear features such as high collision densities in the sputtering volume, amorphization of the crystalline structure, and an enhanced emission of low-energy atoms occur gradually....

  20. Sputtered iridium oxide films (SIROFs) for neural stimulation electrodes

    OpenAIRE

    Cogan, Stuart F.; Ehrlich, Julia; Plante, Timothy D.; Smirnov, Anton; Shire, Douglas B.; Gingerich, Marcus; Rizzo, Joseph F

    2004-01-01

    Sputtered iridium oxide films (SIROFs) deposited by DC reactive sputtering from an iridium metal target have been characterized in vitro for their potential as neural recording and stimulation electrodes. SIROFs were deposited over gold metallization on flexible multielectrode arrays fabricated on thin (15 µm) polyimide substrates. SIROF thickness and electrode areas of 200–1300 nm and 1960–125600 µm2, respectively, were investigated. The charge-injection capacities of the SIROFs were evaluat...

  1. Evolution of bulgeless low surface brightness galaxies

    Science.gov (United States)

    Shao, X.; Hammer, F.; Yang, Y. B.; Liang, Y. C.

    Based on the Sloan Digital Sky Survey DR 7, we investigate the environment, morphology, and stellar population of bulgeless low surface-brightness (LSB) galaxies in a volume-limited sample with redshift ranging from 0.024 to 0.04 and M r LSB galaxies have more young stars and are more metal-poor than regular LSB galaxies. These results suggest that the evolution of LSB galaxies may be driven by their dynamics, including mergers rather than by their large-scale environment.

  2. The radio properties of bright Seyfert galaxies

    Energy Technology Data Exchange (ETDEWEB)

    Giuricin, G.; Mardirossian, F.; Mezzetti, M.; Bertotti, G. (Centro Interuniversitario Regionale per l' Astrofisica e la Cosmologia (Italy) Centre for Advanced Research in Space Optics (Italy))

    1990-03-01

    The radio properties of a sample of 69 bright spectroscopically selected Seyfert galaxies, which suffers from little bias toward Markarian galaxies with strong UV excess. At variance with most of the earlier results, generally based on galaxy samples which are strongly biased toward the inclusion of Markarian objects, there is no clear evidence of a significant difference in the major radio properties (radio power, radio-to-optical luminosity ratio, radio spectral index and radio size) of type 1 and type 2 Seyferts. The resulting observational scenario appears now to be more consistent than before with the idea that Seyfert 2 galaxies are simply Seyfert 1 obscured objects. 70 refs.

  3. Optical Properties of Magnetron sputtered Nickel Thin Films

    Science.gov (United States)

    Twagirayezu, Fidele; Geerts, Wilhelmus J.; Cui, Yubo

    2015-03-01

    The study of optical properties of Nickel (Ni) is important, given the pivotal role it plays in the semiconductor and nano-electronics technology. Ni films were made by DC and RF magnetron sputtering in an ATC Orion sputtering system of AJA on various substrates. The optical properties were studied ex situ by variable angle spectroscopic (220-1000 nm) ellipsometry at room temperature. The data were modeled and analyzed using the Woollam CompleteEase Software fitting ellipsometric and transmission data. Films sputtered at low pressure have optical properties similar to that of Palik. Films sputtered at higher pressure however have a lower refraction index and extinction coefficient. It is expected from our results that the density of the sputtered films can be determined from the ellipsometric quantities. Our experiments also revealed that Ni is susceptible to a slow oxidation changing its optical properties over the course of several weeks. The optical properties of the native oxide differ from those of reactive sputtered NiO similar as found by. Furthermore the oxidation process of our samples is characterized by at least two different time constants.

  4. Evaluation of residual stress in sputtered tantalum thin-film

    Energy Technology Data Exchange (ETDEWEB)

    Al-masha’al, Asa’ad, E-mail: asaad.al@ed.ac.uk; Bunting, Andrew; Cheung, Rebecca

    2016-05-15

    Highlights: • Tantalum thin-films have been deposited by DC magnetron sputtering system. • Thin-film stress is observed to be strongly influenced by sputtering pressure. • Transition towards the compressive stress is ascribed to the annealing at 300 °C. • Expose thin-film to air ambient or ion bombardment lead to a noticeable change in the residual stress. - Abstract: The influence of deposition conditions on the residual stress of sputtered tantalum thin-film has been evaluated in the present study. Films have been deposited by DC magnetron sputtering and curvature measurement method has been employed to calculate the residual stress of the films. Transitions of tantalum film stress from compressive to tensile state have been observed as the sputtering pressure increases. Also, the effect of annealing process at temperature range of 90–300 °C in oxygen ambient on the residual stress of the films has been studied. The results demonstrate that the residual stress of the films that have been deposited at lower sputtering pressure has become more compressive when annealed at 300 °C. Furthermore, the impact of exposure to atmospheric ambient on the tantalum film stress has been investigated by monitoring the variation of the residual stress of both annealed and unannealed films over time. The as-deposited films have been exposed to pure Argon energy bombardment and as result, a high compressive stress has been developed in the films.

  5. The role of the Fraunhofer lines in solar brightness variability

    CERN Document Server

    Shapiro, A I; Krivova, N A; Tagirov, R V; Schmutz, W K

    2015-01-01

    The solar brightness varies on timescales from minutes to decades. A clear identification of the physical processes behind such variations is needed for developing and improving physics-based models of solar brightness variability and reconstructing solar brightness in the past. This is, in turn, important for better understanding the solar-terrestrial and solar-stellar connections. We estimate the relative contributions of the continuum, molecular, and atomic lines to the solar brightness variations on different timescales. Our approach is based on the assumption that variability of the solar brightness on timescales greater than a day is driven by the evolution of the solar surface magnetic field. We calculated the solar brightness variations employing the solar disc area coverage of magnetic features deduced from the MDI/SOHO observations. The brightness contrasts of magnetic features relative to the quiet Sun were calculated with a non-LTE radiative transfer code as functions of disc position and waveleng...

  6. TiN films grown by reactive magnetron sputtering with enhanced ionization at low discharge pressures

    Energy Technology Data Exchange (ETDEWEB)

    Kadlec, S.; Musil, J. (Ceskoslovenska Akademie Ved, Prague (Czechoslovakia). Fyzikalni Ustav); Valvoda, V. (Karlova Univ., Prague (Czechoslovakia). Fakulta Matematicko-Fyzikalni); Muenz, W.-D.; Petersein, H.; Schroeder, J. (Leybold A.G., Hanau (Germany, F.R.))

    1990-01-01

    TiN films were produced by reactive magnetron sputtering at a discharge pressure of 0.09 Pa on substrates placed 200 mm away from the magnetron target, using a sputtering system with enhanced ionization by means of multipolar magnetic confinement. The effects on film properties are reported for two ranges of values: an external substrate bias U{sub s} of from -35 to -150 V, and a floating potential U{sub fl} of from -24 to -45 V. All films show a dense microstructure, a smooth surface and shiny golden color. The microhardness HV is between 2000 and 2600 kg mm{sup -1}, a high critical load of up to L{sub c} = 58 N in scratch tests and the coefficient of friction against a cemented carbide counter ball is between 0.12 and 0.22. The color co-ordinated L{sup *}, A{sup *} and B{sup *} depend on the bias voltage. The brightness L{sup *} reaches 78 CIELAB units. The properties of films prepared at U{sub s} between -60 and -150 V compare well to those of ion-plated films. The films prepared at U{sub s} < 60 V, or at any of the values for U{sub fl}, exhibit comparatively low compressive microstresses down to 2.2 GPa and low microstrain down to 3.5 x 10{sup -3}. These films show single (111), (200) or (220) textures, or a mixed (200) + (111) texture, depending on the U value at which they were prepared. (author).

  7. Influence of sputtering pressure on the structural, optical and hydrophobic properties of sputtered deposited HfO{sub 2} coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dave, V. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Dubey, P. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Gupta, H.O. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Chandra, R. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India)

    2013-12-31

    The aim of this work is to develop hydrophobic coatings for outdoor insulators using sputtering technique. Hafnium oxide is characterized by high dielectric constant, large band gap (5.6 eV), high refractive index (2.1) and good mechanical, thermal and chemical properties. Hence HfO{sub 2} is suitable as a protective coating for outdoor insulators used in the transmission line and transformers. Hafnium oxide coatings were deposited on glass substrates by DC magnetron sputtering technique at a sputtering pressure of 5 mTorr, 10 mTorr, 15 mTorr, 20 mTorr and 25 mTorr. The deposited films were characterized by techniques like X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle goniometry and UV–vis-NIR spectrophotometer. The average crystallite size calculated from XRD peaks shows that it increases with increase in sputtering pressure up to 15 mTorr and then it starts decreasing. The roughness calculated from AFM images shows the similar trend. The deposited films were found to be hydrophobic and transparent. The hydrophobicity of the films was correlated with the roughness calculated from AFM. The effect of sputtering pressure was also investigated on optical band gap and refractive index calculated from transmission and absorption data. The electrical resistivity was found to be high, thus ensuring insulating property of the deposited films. - Highlights: • Outdoor Insulators are suffering from environment pollution problem. • To mitigate problem, hydrophobic coating of HfO{sub 2} was synthesized by DC sputtering. • Effect of sputtering pressure was studied on structural, optical and hydrophobic properties of HfO{sub 2} • Optimum results were obtained at a sputtering pressure of 15 mTorr.

  8. Plasma production for electron acceleration by resonant plasma wave

    Science.gov (United States)

    Anania, M. P.; Biagioni, A.; Chiadroni, E.; Cianchi, A.; Croia, M.; Curcio, A.; Di Giovenale, D.; Di Pirro, G. P.; Filippi, F.; Ghigo, A.; Lollo, V.; Pella, S.; Pompili, R.; Romeo, S.; Ferrario, M.

    2016-09-01

    Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10-100 GV/m), enabling acceleration of electrons to GeV energy in few centimeter. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators (large energy spread, low repetition rate, and large emittance); radiofrequency-based accelerators, in fact, are limited in accelerating field (10-100 MV/m) requiring therefore hundred of meters of distances to reach the GeV energies, but can provide very bright electron bunches. To combine high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of short bunches, we have started to study the requirements in terms of plasma for SPARC_LAB (Ferrario et al., 2013 [1]). In particular here we focus on hydrogen plasma discharge, and in particular on the theoretical and numerical estimates of the ionization process which are very useful to design the discharge circuit and to evaluate the current needed to be supplied to the gas in order to have full ionization. Eventually, the current supplied to the gas simulated will be compared to that measured experimentally.

  9. Plasma production for electron acceleration by resonant plasma wave

    Energy Technology Data Exchange (ETDEWEB)

    Anania, M.P., E-mail: maria.pia.anania@lnf.infn.it [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Biagioni, A.; Chiadroni, E. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Cianchi, A. [University of Rome Tor Vergata - INFN, via della Ricerca Scientifica, 1, 00133 Roma (Italy); INFN, Via della Ricerca Scientifica, 1, 00133 Roma (Italy); Croia, M.; Curcio, A. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Di Giovenale, D.; Di Pirro, G.P. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Filippi, F. [University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Ghigo, A.; Lollo, V.; Pella, S.; Pompili, R. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); Romeo, S. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy); University of Rome La Sapienza, Piazzale Aldo Moro, 2, 00185 Roma (Italy); Ferrario, M. [INFN - LNF, via Enrico Fermi, 40, 00044 Frascati (Italy)

    2016-09-01

    Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10–100 GV/m), enabling acceleration of electrons to GeV energy in few centimeter. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators (large energy spread, low repetition rate, and large emittance); radiofrequency-based accelerators, in fact, are limited in accelerating field (10–100 MV/m) requiring therefore hundred of meters of distances to reach the GeV energies, but can provide very bright electron bunches. To combine high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of short bunches, we have started to study the requirements in terms of plasma for SPARC-LAB (Ferrario et al., 2013 [1]). In particular here we focus on hydrogen plasma discharge, and in particular on the theoretical and numerical estimates of the ionization process which are very useful to design the discharge circuit and to evaluate the current needed to be supplied to the gas in order to have full ionization. Eventually, the current supplied to the gas simulated will be compared to that measured experimentally.

  10. Spectral evolution of bright NS LMXBs

    CERN Document Server

    Paizis, A; Mainardi, L I; Titarchuk, L

    2010-01-01

    Theoretical and observational support suggests that the spectral evolution of neutron-star LMXBs, including transient hard X-ray tails, may be explained by the interplay between thermal and bulk motion Comptonization. In this framework, we developed a new model for the X-ray spectral fitting XSPEC package which takes into account the effects of both thermal and dynamical (i.e. bulk) Comptonization, CompTB. Using data from the INTEGRAL satellite, we tested our model on broad band spectra of a sample of persistently low magnetic field bright neutron star Low Mass X-ray Binaries, covering different spectral states. The case of the bright source GX 5-1 is presented here. Particular attention is given to the transient powerlaw-like hard X-ray (above 30 keV) tail that we interpret in the framework of the bulk motion Comptonization process, qualitatively describing the physical conditions of the environment in the innermost part of the system.

  11. Sublimation in bright spots on (1) Ceres.

    Science.gov (United States)

    Nathues, A; Hoffmann, M; Schaefer, M; Le Corre, L; Reddy, V; Platz, T; Cloutis, E A; Christensen, U; Kneissl, T; Li, J-Y; Mengel, K; Schmedemann, N; Schaefer, T; Russell, C T; Applin, D M; Buczkowski, D L; Izawa, M R M; Keller, H U; O'Brien, D P; Pieters, C M; Raymond, C A; Ripken, J; Schenk, P M; Schmidt, B E; Sierks, H; Sykes, M V; Thangjam, G S; Vincent, J-B

    2015-12-10

    The dwarf planet (1) Ceres, the largest object in the main asteroid belt with a mean diameter of about 950 kilometres, is located at a mean distance from the Sun of about 2.8 astronomical units (one astronomical unit is the Earth-Sun distance). Thermal evolution models suggest that it is a differentiated body with potential geological activity. Unlike on the icy satellites of Jupiter and Saturn, where tidal forces are responsible for spewing briny water into space, no tidal forces are acting on Ceres. In the absence of such forces, most objects in the main asteroid belt are expected to be geologically inert. The recent discovery of water vapour absorption near Ceres and previous detection of bound water and OH near and on Ceres (refs 5-7) have raised interest in the possible presence of surface ice. Here we report the presence of localized bright areas on Ceres from an orbiting imager. These unusual areas are consistent with hydrated magnesium sulfates mixed with dark background material, although other compositions are possible. Of particular interest is a bright pit on the floor of crater Occator that exhibits probable sublimation of water ice, producing haze clouds inside the crater that appear and disappear with a diurnal rhythm. Slow-moving condensed-ice or dust particles may explain this haze. We conclude that Ceres must have accreted material from beyond the 'snow line', which is the distance from the Sun at which water molecules condense.

  12. Internetwork chromospheric bright grains observed with IRIS

    CERN Document Server

    Martínez-Sykora, Juan; Carlsson, Mats; De Pontieu, Bart; Pereira, Tiago M D; Boerner, Paul; Hurlburt, Neal; Kleint, Lucia; Lemen, James; Tarbell, Ted D; Title, Alan; Wuelser, Jean-Pierre; Hansteen, Viggo H; Golub, Leon; McKillop, Sean; Reeves, Kathy K; Saar, Steven; Testa, Paola; Tian, Hui; Jaeggli, Sarah; Kankelborg, Charles

    2015-01-01

    The Interface Region Imaging Spectrograph (IRIS) reveals small-scale rapid brightenings in the form of bright grains all over coronal holes and the quiet sun. These bright grains are seen with the IRIS 1330 \\AA, 1400 \\AA\\ and 2796 \\AA\\ slit-jaw filters. We combine coordinated observations with IRIS and from the ground with the Swedish 1-m Solar Telescope (SST) which allows us to have chromospheric (Ca II 8542 \\AA, Ca II H 3968 \\AA, H\\alpha, and Mg II k 2796 \\AA), and transition region (C II 1334 \\AA, Si IV 1402) spectral imaging, and single-wavelength Stokes maps in Fe I 6302 \\AA at high spatial (0.33"), temporal and spectral resolution. We conclude that the IRIS slit-jaw grains are the counterpart of so-called acoustic grains, i.e., resulting from chromospheric acoustic waves in a non-magnetic environment. We compare slit-jaw images with spectra from the IRIS spectrograph. We conclude that the grain intensity in the 2796 \\AA\\ slit-jaw filter comes from both the Mg II k core and wings. The signal in the C II ...

  13. Mechanical electrodeposition of bright nanocrystalline nickel

    Institute of Scientific and Technical Information of China (English)

    ZHU ZengWei; ZHU Di; QU NingSong

    2008-01-01

    A new mechanical electrodeposition technology was proposed,and nanocrystal-line nickel deposit with bright and smooth surface was prepared in the bath without any additive agents.Unlike traditional methods,the novel technology employed dynamical hard particles to continuously polish the cathode surface and disturb the nearby solution during electrodepositing.Experimental results showed that the polishing effect of hard particles can effectively prevent the hydrogen bubbles and impurities from adhering on the deposit surface and avoid the production of pits,pinholes and nodules.Furthermore,comparing with the deposit prepared by tradi-tional methods,the one prepared by the novel technology was substantially refined with grain size ranging from 30 to 80 nm.Every diffraction peak's intensity of the deposit was reduced,the preferential orientation degree of (200) decreased and those of (111) and (220) increased.The microhardness notably increased.The magnetic properties were also changed with decreased saturation magnetization and increased coercive force.It was also found that variation of current density and cathode rotational speed could affect the structure and properties of the nickel deposits prepared by this technology.Key.words:electrodeposition,electroforming,hard particle,nanocrystalline,bright nickel deposits prepared by this technology.

  14. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  15. Status of Plasma Physics Techniques for the Deposition of Tribological Coatings

    Science.gov (United States)

    Spalvins, T.

    1984-01-01

    The plasma physics deposition techniques of sputtering and ion-plating are reviewed. Their characteristics and potentials are discussed in terms of synthesis or deposition of tribological coatings. Since the glow discharge or plasma generated in the conventional sputtering and ion-plating techniques has a low ionization efficiency, rapid advances have been made in equipment design to further increase the ionization efficiency. The enhanced ionization favorably affects the nucleation and growth sequence of the coating. This leads to improved adherence and coherence, higher density, favorable morphological growth, and reduced internal stresses in the coatings. As a result, desirable coating characteristics can be precision tailored. Tribological coating characteristics of sputtered solid film lubricants such as MoS2, ion-plated soft gold and lead metallic films, and sputtered and ion-plated wear-resistant refractory compound films such as nitrides and carbides are discussed.

  16. INVESTIGATION ON THE CAUSES OF EUCALYPTUS KRAFT PULP BRIGHTNESS REVERSION

    Directory of Open Access Journals (Sweden)

    Kátia M. M. Eiras

    2005-12-01

    Full Text Available Some high brightness eucalyptus Kraft pulps have shown poor brightness stability. In most cases, the causes have notbeen identified and permanent solutions have not been found. This work focused on evaluating the brightness stability profile of pulpsbleached by in sequences such as O(DC(PODD, O(DC(PODP, OD(PODD, OD(PODP, ODHT(PODD, ODHT(PODP, OA/D(PODD, OA/D(PODP, OAD(PODD and O(ZeD(PO. Brightness stability tests induced by according to Tappi UM200 procedureon samples bleached to 90±0.5% ISO. Brightness stability was measured after each bleaching stage of the various sequences andexpressed as brightness loss in % ISO. The results indicate that pulps bleached with sequences ending with a peroxide stage havehigher brightness stability compared to those ending with a chlorine dioxide stage. Pulps bleached with a standard sequence, initiatingwith a (DC stage, show brightness stability similar to that of pulp bleached by an ECF (Elementary chlorine free sequence initiatingwith a regular D0 stage. ECF sequences, initiated with hot stages produce pulps with higher brightness stability than sequencesinitiating with a regular D0 stage. The profile across the bleaching sequences shows a tendency of increased brightness stability inalkaline stages containing peroxide and decreased stability in those stages containing chlorine and/or chlorine dioxide, parallelingpulp carbonyl group content.

  17. Ultra-bright laser-driven neutron source

    Science.gov (United States)

    Roth, M.; Favalli, A.; Bagnoud, V.; Bridgewater, J.; Deppert, O.; Devlin, M.; Falk, K.; Fernndez, J.; Gautier, D.; Guler, N.; Henzlova, D.; Hornung, J.; Iliev, M.; Ianakiev, K.; Kleinschmidt, A.; Koehler, K.; Palaniyappan, S.; Poth, P.; Schaumann, G.; Swinhoe, M.; Taddeucci, T.; Tebartz, A.; Wagner, Florian; Wurden, G.

    2015-11-01

    Short-pulse laser-driven neutron sources have become a topic of interest since their brightness and yield have recently increased by orders of magnitude. Using novel target designs, high contrast - high power lasers and compact converter/moderator setups, these neutron sources have finally reached intensities that make many interesting applications possible. We present the results of two experimental campaigns on the GSI PHELIX and the LANL Trident lasers from 2015. We have produced an unprecedented neutron flux, mapped the spatial distribution of the neutron production as well as its energy spectra and ultimately used the beam for first applications to show the prospect of these new compact sources. We also made measurements for the conversion of energetic neutrons into short epithermal and thermal neutron pulses in order to evaluate further applications in dense plasma research. The results address a large community as it paves the way to use short pulse lasers as a neutron source. This can open up neutron research to a broad academic community including material science, biology, medicine and high energy density physics to universities and therefore can complement large scale facilities like reactors or particle accelerators.

  18. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field.

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  19. Substrate Frequency Effects on Cr x N Coatings Deposited by DC Magnetron Sputtering

    Science.gov (United States)

    Obrosov, Aleksei; Naveed, Muhammad; Volinsky, Alex A.; Weiß, Sabine

    2016-11-01

    Controlled ion bombardment is a popular method to fabricate desirable coating structures and modify their properties. Substrate biasing at high frequencies is a possible technique, which allows higher ion density at the substrate compared with DC current bias. Moreover, high ion energy along with controlled adatom mobility would lead to improved coating growth. This paper focuses on a similar type of study, where effects of coating growth and properties of DC magnetron-sputtered chromium nitride (Cr x N) coatings at various substrate bias frequencies are discussed. Cr x N coatings were deposited by pulsed DC magnetron sputtering on Inconel 718 and (100) silicon substrates at 110, 160 and 280 kHz frequency at low duty cycle. Coating microstructure and morphology were studied by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), scratch adhesion testing and nanoindentation. Results indicate a transformation of columnar into glassy structure of Cr x N coatings with the substrate bias frequency increase. This transformation is attributed to preferential formation of the Cr2N phase at high frequencies compared with CrN at low frequencies. Increase in frequency leads to an increase in deposition rate, which is believed to be due to increase in plasma ion density and energy of the incident adatoms. An increase in coating hardness along with decrease in elastic modulus was observed at high frequencies. Scratch tests show a slight increase in coating adhesion, whereas no clear increase in coating roughness can be found with the substrate bias frequency.

  20. Effects of Various RF Powers on CdTe Thin Film Growth Using RF Magnetron Sputtering

    Science.gov (United States)

    Alibakhshi, Mohammad; Ghorannevis, Zohreh

    2016-09-01

    Cadmium telluride (CdTe) film was deposited using the magnetron sputtering system onto a glass substrate at various deposition times and radio frequency (RF) powers. Ar gas was used to generate plasma to sputter the CdTe atoms from CdTe target. Effects of two experimental parameters of deposition time and RF power were investigated on the physical properties of the CdTe films. X-ray Diffraction (XRD) analysis showed that the films exhibited polycrystalline nature of CdTe structure with the (111) orientation as the most prominent peak. Optimum condition to grow the CdTe film was obtained and it was found that increasing the deposition time and RF power increases the crystallinity of the films. From the profilometer and XRD data's, the thicknesses and crystal sizes of the CdTe films increased at the higher RF power and the longer deposition time, which results in affecting the band gap as well. From atomic force microscopy (AFM) analysis we found that roughnesses of the films depend on the deposition time and is independent of the RF power.

  1. Preparation of zinc tin oxide films by reactive magnetron sputtering of Zn on liquid Sn

    Energy Technology Data Exchange (ETDEWEB)

    Pau, J.L., E-mail: joseluis.pau@uam.e [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain); Scheffler, L.; Hernandez, M.J.; Cervera, M.; Piqueras, J. [Laboratorio de Microelectronica, Dept. de Fisica Aplicada, Universidad Autonoma de Madrid, c/ Francisco Tomas y Valiente 7, 28049 Madrid (Spain)

    2010-09-30

    Zn is sputter-deposited on melted Sn films by radio-frequency magnetron sputtering in oxidizing plasma. The samples present an absorption cut-off wavelength close to the one of ZnO, and an optical transparency higher than 50% in the visible range. Ex-situ thermal annealing improves visible transparency and produces a slight blue-shift in the optical bandgap. X-ray diffraction patterns show typical spectra due to polycrystalline ZnO with evidence of the presence of crystalline SnO, before annealing, and Zn{sub 2}SnO{sub 4}, after annealing. Rutherford Backscattering studies reveal the existence of a ZnO layer on top of an O-rich (Zn, Sn)O thin film. After optimal thermal treatment, electrical characterization exhibits carrier concentrations of 10{sup 16}-10{sup 17} cm{sup -3} and mobilities of 20-80 cm{sup 2} V{sup -1} s{sup -1} for the resulting (Zn, Sn)O n-type films.

  2. Influence of the sputtering pressure on the properties of transparent conducting zirconium-doped zinc oxide films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    刘汉法; 张化福; 类成新; 袁长坤

    2009-01-01

    Transparent conducting zirconium-doped zinc oxide films with high transparency and relatively low re-sistivity have been successfully prepared on water-cooled glass substrate by radio frequency magnetron sputtering at room temperature. The Ar sputtering pressure was varied from 0.5 to 3 Pa. The crystallinity increases and the electri-cal resistivity decreases when the sputtering pressure increases from 0.5 to 2.5 Pa. The cystallinity decreases and the electrical resistivity increases when the sputtering pressure increases from 2.5 to 3 Pa. When the sputtering pressure The deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrate.

  3. Sputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays

    Energy Technology Data Exchange (ETDEWEB)

    Banakh, Oksana, E-mail: oksana.banakh@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Moussa, Mira, E-mail: mira.moussa@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Matthey, Joel, E-mail: joel.matthey@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Pontearso, Alessandro, E-mail: alessandro.pontearso@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Cattani-Lorente, Maria, E-mail: maria.cattani-lorente@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Sanjines, Rosendo, E-mail: rosendo.sanjines@epfl.ch [Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Condensed Matter Physics, Station 3, CH-1015 Lausanne (Switzerland); Fontana, Pierre, E-mail: Pierre.Fontana@hcuge.ch [Haemostasis laboratory, Geneva University Hospital, Rue Gabrielle-Perret-Gentil 4, CH-1205 Geneva (Switzerland); Wiskott, Anselm, E-mail: anselm.wiskott@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Durual, Stephane, E-mail: stephane.durual@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland)

    2014-10-30

    Highlights: • Titanium oxynitride coatings (TiN{sub x}O{sub y}) with chemical composition ranging from TiN to TiO{sub 2} were deposited by magnetron sputtering from a metallic Ti target using a mixture of O{sub 2} + N{sub 2}. • The coatings structure as well as physical, chemical and mechanical properties progressively changes as a function of oxygen content in the TiN{sub x}O{sub y.} • All TiN{sub x}O{sub y} coatings show a significantly higher level of bioactivity as compared to bare Ti substrates (1.2 to 1.4 fold increase in cell proliferation). Despite variations in surface chemistry, topography and surface tension observed on films as a function of chemical composition, no significant differences in the films’ biological activity were observed after 3 days of testing. - Abstract: Titanium oxynitride coatings (TiN{sub x}O{sub y}) are considered a promising material for applications in dental implantology due to their high corrosion resistance, their biocompatibility and their superior hardness. Using the sputtering technique, TiN{sub x}O{sub y} films with variable chemical compositions can be deposited. These films may then be set to a desired value by varying the process parameters, that is, the oxygen and nitrogen gas flows. To improve the control of the sputtering process with two reactive gases and to achieve a variable and controllable coating composition, the plasma characteristics were monitored in-situ by optical emission spectroscopy. TiN{sub x}O{sub y} films were deposited onto commercially pure (ASTM 67) microroughened titanium plates by reactive magnetron sputtering. The nitrogen gas flow was kept constant while the oxygen gas flow was adjusted for each deposition run to obtain films with different oxygen and nitrogen contents. The physical and chemical properties of the deposited films were analyzed as a function of oxygen content in the titanium oxynitride. The potential application of the coatings in dental implantology was assessed by

  4. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering.

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-20

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

  5. High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)

    2011-01-15

    We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  6. Coupling Bright and Dark Plasmonic Lattice Resonances

    CERN Document Server

    Rodriguez, S R K; Maes, B; Janssen, O T A; Vecchi, G; Rivas, J Gomez

    2011-01-01

    We demonstrate the coupling of bright and dark Surface Lattice Resonances (SLRs), which are collective Fano resonances in 2D plasmonic crystals. As a result of this coupling, a frequency stop-gap in the dispersion relation of SLRs is observed. The different field symmetries of the low and high frequency SLR bands lead to pronounced differences in their coupling to free space radiation. Standing waves of very narrow spectral width compared to localized surface plasmon resonances are formed at the high frequency band edge, while subradiant damping onsets at the low frequency band edge leading the resonance into darkness. We introduce a coupled oscillator analog to the plasmonic crystal, which serves to elucidate the physics of the coupled plasmonic resonances and to estimate very high quality factors (Q>700) for SLRs, which are the highest known for any 2D plasmonic crystal.

  7. Hybrid quantum repeater using bright coherent light.

    Science.gov (United States)

    van Loock, P; Ladd, T D; Sanaka, K; Yamaguchi, F; Nemoto, Kae; Munro, W J; Yamamoto, Y

    2006-06-23

    We describe a quantum repeater protocol for long-distance quantum communication. In this scheme, entanglement is created between qubits at intermediate stations of the channel by using a weak dispersive light-matter interaction and distributing the outgoing bright coherent-light pulses among the stations. Noisy entangled pairs of electronic spin are then prepared with high success probability via homodyne detection and postselection. The local gates for entanglement purification and swapping are deterministic and measurement-free, based upon the same coherent-light resources and weak interactions as for the initial entanglement distribution. Finally, the entanglement is stored in a nuclear-spin-based quantum memory. With our system, qubit-communication rates approaching 100 Hz over 1280 km with fidelities near 99% are possible for reasonable local gate errors.

  8. Brightness temperature for 166 radio sources

    Institute of Scientific and Technical Information of China (English)

    Jun-Hui Fan; Yong Huang; Yu-Hai Yuan; Jiang-He Yang; Yi Liu; Jun Tao; Ying Gao; Tong-Xu Hua; Rui-Guang Lin; Jiang-Shui Zhang; Jing-Yi Zhang; Yi-Ping Qin

    2009-01-01

    Using the database of the University of Michigan Radio Astronomy Observatory (UMRAO) at three radio frequencies (4.8, 8 and 14.5 GHz), we determined the short-term variability timescales for 166 radio sources. The timescales are 0.15d (2007+777) to 176.17d (0528-250) with an average timescale of △tobs=17.1±16.5d for the whole sample. The timescales are used to calculate the brightness temperatures, TB. The value of log TB is in the range of log TB = 10.47 to 19.06 K. In addition, we also estimated the boosting factor for the sources. The correlation between the polarization and the Doppler factor is also discussed.

  9. Substructure of Quiet Sun Bright Points

    CERN Document Server

    Andic, Aleksandra; Goode, Phillip R

    2010-01-01

    Since photospheric bright points (BPs) were first observed, there has been a question as to how are they structured. Are they just single flux tubes or a bundle of the flux-tubes? Surface photometry of the quiet Sun (QS) has achieved resolution close to 0.1" with the New Solar Telescope at Big Bear Solar Observatory. This resolution allowed us to detect a richer spectrum of BPs in the QS. The smallest BPs we observed with TiO 705.68 nm were 0.13", and we were able to resolve individual components in some of the BPs clusters and ribbons observed in the QS, showing that they are composed of the individual BPs. Average size of observed BPs was 0.22".

  10. Dark Skies, Bright Kids Year 8

    Science.gov (United States)

    Bittle, Lauren E.; Wenger, Trey; Johnson, Kelsey E.; Angell, Dylan; Burkhardt, Andrew; Davis, Blair; Firebaugh, Ariel; Hancock, Danielle; Richardson, Whitney; Rochford Hayes, Christian; Linden, Sean; Liss, Sandra; Matthews, Allison; McNair, Shunlante; Prager, Brian; Pryal, Matthew; Troup, Nicholas William

    2017-01-01

    We present activities from the eighth year of Dark Skies Bright Kids (DSBK), an entirely volunteer-run outreach organization based out of the Department of Astronomy at the University of Virginia. Our core mission is to enhance elementary science education and literacy in Central Virginia through fun, hands-on activities that introduce basic Astronomy concepts. Over the past seven years, our primary focus has been hosting an 8-10 week after-school astronomy club at underserved elementary and middle schools, and over the past several years, we have partnered with local businesses to host our Annual Central Virginia Star Party, a free event open to the community featuring star-gazing and planetarium shows. This past summer we expanded our reach through a new initiative to bring week-long summer day camps to south and southwest Virginia, home to some of the most underserved communities in the commonwealth.

  11. Tunneling Dynamics Between Atomic Bright Solitons

    CERN Document Server

    Zhao, Li-Chen; Yang, Zhan-Ying; Yang, Wen-Li

    2016-01-01

    We investigate tunneling behavior between two bright solitons in a Bose-Einstein condensate with attractive contact interactions between atoms. The explicit tunneling properties including tunneling particles and oscillation period are described analytically, which indicates that the periodic tunneling form is a nonlinear Josephson type oscillation. The results suggest that the breathing behavior of solitons comes from the tunneling mechanism in an effective double-well potential, which is quite different from the modulational instability mechanism for Akhmediev breather and K-M breather. Furthermore, we obtain a phase diagram for two soliton interaction which admits tunneling property, particle-like property, interference property, and a resonant interaction case. The explicit conditions for them are clarified based on the defined critical distance $d_c$ and spatial interference period $D$.

  12. Improvement of the homogeneity of high mobility In{sub 2}O{sub 3}:H films by sputtering through a mesh electrode studied by Monte Carlo simulation and thin film analysis

    Energy Technology Data Exchange (ETDEWEB)

    Scherg-Kurmes, Harald; Hafez, Ahmad; Szyszka, Bernd [Technische Universitaet Berlin, Einsteinufer 25, 10587, Berlin (Germany); Siemers, Michael; Pflug, Andreas [Fraunhofer IST, Bienroder Weg 54E, 38108, Braunschweig (Germany); Schlatmann, Rutger [Helmholtz Zentrum Berlin, PVcomB, Schwarzschildstr. 3, 12489, Berlin (Germany); Rech, Bernd [Helmholtz Zentrum Berlin, Institute for Silicon Photovoltaics, Kekulestrasse 5, 12489, Berlin (Germany)

    2016-09-15

    Hydrogen-doped indium oxide (IOH) is a transparent conductive oxide offering great potential to optoelectronic applications because of its high mobility of over 100 cm{sup 2} V{sup -1}s{sup -1}. In films deposited statically by RF magnetron sputtering, a small area directly opposing the target center with a higher resistivity and lower crystallinity than the rest of the film has been found via hall- and XRD-measurements, which we attribute to plasma damage. In order to investigate the distribution of particle energies during the sputtering process we have simulated the RF-sputtering deposition process of IOH by particle-in-cell Monte Carlo (PICMC) simulation. At the surface of ceramic sputtering targets, negatively charged oxygen ions are created. These ions are accelerated toward the substrate in the plasma sheath with energies up to 150 eV. They damage the growing film and reduce its crystallinity. The influence of a negatively biased mesh inside the sputtering chamber on particle energies and distributions has been simulated and investigated. We found that the mesh decreased the high-energetic oxygen ion density at the substrate, thus enabling a more homogeneous IOH film growth. The theoretical results have been verified by XRD X-ray diffractometry (XRD), 4-point probe, and hall measurements of statically deposited IOH films on glass. (copyright 2016 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  13. Fast charge exchange ions in high power impulse magnetron sputtering of titanium as probes for the electrical potential

    Science.gov (United States)

    Breilmann, W.; Maszl, C.; von Keudell, A.

    2017-03-01

    High power impulse magnetron sputtering (HiPIMS) plasmas exhibit a high ionization fraction of the sputtered material and ions with high kinetic energies, which produce thin films with superior quality. These ion energy distribution functions (IEDF) contain energetic peaks, which are believed to be linked to a distinct electrical potential hump {{Δ }}{{{Φ }}}{{ionization}{{zone}}} inside rotating localized ionization zones, so called spokes, at target power densities above 1 kW cm‑2. Any direct measurement of this electrical potential structure is, however, very difficult due to the dynamic nature of the spokes and the very high local power density, which hampers the use of conventional emissive probes. Instead, we use a careful analysis of the IEDFs for singly and doubly charged titanium ions from a HiPIMS plasma at varying target power density. The energy peaks in the IEDFs measured at the substrate depend on the point of ionization and any charge exchange collisions on the path between ionization and impact at the substrate. Thereby, the IEDFs contain a convoluted information about the electrical potential structure inside the plasma. The analysis of these IEDFs reveal that higher ionization states originate at high target power densities from the central part of the plasma spoke, whereas singly charged ions originate from the perimeter of the plasma spoke. Consequently, we observe different absolute ion energies with the energy of Ti2+ being slightly higher than two times the energy of Ti+. Additional peaks are observed in the IEDFs of Ti+ originating from charge exchange reactions from Ti2+ and Ti3+ with titanium neutrals. Based on this analysis of the IEDFs, the structure of the electrical potential inside a spoke is inferred yielding {{Δ }}{{{Φ }}}{{ionization}{{zone}}} = 25 V above the plasma potential, irrespective of target power density.

  14. Sputtering of a metal nanofoam by Au ions

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Christian [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Bringa, Eduardo M. [CONICET, Mendoza 5500 (Argentina); Instituto de Ciencias Básicas, Universidad Nacional de Cuyo, Mendoza 5500 (Argentina); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany)

    2015-01-01

    Porous materials, such as nanofoams, may react differently to irradiation than compact targets. This is caused by the influence of the cavities on the evolution of collision cascades, but also by the differing heat conduction which affects the spike phase. Using molecular dynamics simulation we study the sputtering of a Au nanofoam by 10 keV Au projectiles, and compare to the sputtering of a compact Au target. These bombardment conditions lead to a strong contribution of spikes to the sputtering process. We find the foam to sputter considerably less than the compact target; the open structure of the foam prevents the build-up of strong collision spike regions at the surface, which are the major source of sputtering in the compact target. Also emission takes a longer time scale in the foam, as particles need to travel longer pathways to be emitted. On the other hand, the molten phase is more extended in the foam and also exists for a longer time; this is caused by the reduced heat conductivity in this material.

  15. Nitinol: Tubing versus sputtered film - microcleanliness and corrosion behavior.

    Science.gov (United States)

    Wohlschlögel, Markus; Lima de Miranda, Rodrigo; Schüßler, Andreas; Quandt, Eckhard

    2016-08-01

    Corrosion behavior and microcleanliness of medical-device grade Nitinol tubing (Nix Ti1- x , x = 0.51; outer diameter 7 mm, wall thickness 0.5 mm), drawn from various ingot qualities, are compared to the characteristics of sputtered Nitinol film material (Nix Ti1- x , x = 0.51; thickness 50 µm). Electropolished tubing half-shell samples are tested versus as-received sputtered film samples. Inclusion size distributions are assessed using quantitative metallography and corrosion behavior is investigated by potentiodynamic polarization testing in phosphate-buffered saline at body temperature. For the sputtered film samples, the surface chemistry is additionally analyzed employing Auger Electron Spectroscopy (AES) composition-depth profiling. Results show that the fraction of breakdowns in the potentiodynamic polarization test correlates with number and size of the inclusions in the material. For the sputtered Nitinol film material no inclusions were detectable by light microscopy on the one hand and no breakdowns were found in the potentiodynamic polarization test on the other hand. As for electropolished Nitinol, the sputtered Nitinol film material reveals Nickel depletion and an Oxygen-to-Titanium intensity ratio of ∼2:1 in the surface oxide layer, as measured by AES. © 2015 Wiley Periodicals, Inc. J Biomed Mater Res Part B: Appl Biomater, 104B: 1176-1181, 2016.

  16. Projectile charge state dependent sputtering of solid surfaces

    CERN Document Server

    Hayderer, G

    2000-01-01

    dependence on the ion kinetic energy. This new type of potential sputtering not only requires electronic excitation of the target material, but also the formation of a collision cascade within the target in order to initiate the sputtering process and has therefore been termed kinetically assisted potential sputtering. In order to study defects induced by potential sputtering on the atomic scale we performed measurements of multiply charged Ar ion irradiated HOPG (highly oriented pyrolitic graphite) samples with scanning tunneling microscopy (STM). The only surface defects found in the STM images are protrusions. The mean diameter of the defects increases with projectile charge state while the height of the protrusions stays roughly the same indicating a possible pre-equilibrium effect of the stopping of slow multiply charged projectiles in HOPG. Total sputter yields for impact of slow singly and multiply charged ions on metal- (Au), oxide- (Al2O3, MgO) and alkali-halide surfaces (LiF) have been measured as a...

  17. Sputter-ion plating of coatings for protection of gas-turbine blades against high-temperature oxidation and corrosion

    Science.gov (United States)

    Coad, J. P.; Restall, J. E.

    1982-01-01

    Considerable effort is being devoted to the development of overlay coatings for protecting critical components such as turbine blades against high-temperature oxidation, corrosion, and erosion damage in service. The most commercially advanced methods for depositing coatings are electron-beam evaporation and plasma spraying. Sputter-ion plating (SIP) offers a potentially cheaper and simpler alternative method for depositing overlays. Experimental work on SIP of Co-Cr-Al-Y and Ni-Cr-Al-Ti alloy coatings is described. Results are presented of metallographic assessment of these coatings, and of the results obtained from high-velocity testing using a gas-turbine simulator rig.

  18. Ion beam analysis, corrosion resistance and nanomechanical properties of TiAlCN/CNx multilayer grown by reactive magnetron sputtering

    OpenAIRE

    Alemon, B.; Flores, M.; Canto, C.; E. Andrade; O.G. de Lucio; M.F. Rocha; Broitman, Esteban

    2014-01-01

    A novel TiAlCN/CNx, multilayer coating, consisting of nine TiAlCN/CNx periods with a top layer 0.5 mu m of CNx, was designed to enhance the corrosion resistance of CoCrMo biomedical alloy. The multilayers were deposited by dc and RF reactive magnetron sputtering from Ti0.5Al0.5 and C targets respectively in a N-2/Ar plasma. The corrosion resistance and mechanical properties of the multilayer coatings were analyzed and compared to CoCrMo bulk alloy. Ion beam analysis (IBA) and X-ray diffractio...

  19. Stability of Bright Solitons in Bose-Einstein Condensates

    Institute of Scientific and Technical Information of China (English)

    YU Hui-You; YAN Jia-Ren; XIE Qiong-Tao

    2004-01-01

    We investigate the stability of bright solitons in Bose-Einstein condensates by including a feeding term and a loss one in the Gross-Pitaevskii equation. Based on the direct approach of perturbation theory for the nonlinear Schrodinger equation, we give the explicit dependence of the height and other related quantities of bright solitons on the feeding and loss term. It is found that the three-body recombination loss plays a crucial role in stabilizing bright solitons.

  20. Research on Brightness Measurement of Intense Electron Beam

    CERN Document Server

    Wang, Yuan; Zhang, Huang; Yang, GuoJun; Li, YiDing; Li, Jin

    2015-01-01

    The mostly research fasten on high emission density of injector to study electron beam's brightness in LIA. Using the injector(2MeV) was built to research brightness of multi-pulsed high current(KA) electron beam, and researchs three measurement method (the pepper-pot method, beam collimator without magnetic field, beam collimator with magnetic field method) to detect beam's brightness with time-resolved measurement system.

  1. RadioAstron Observations of the Quasar 3C273: a Challenge to the Brightness Temperature Limit

    CERN Document Server

    Kovalev, Y Y; Kellermann, K I; Lobanov, A P; Johnson, M D; Gurvits, L I; Voitsik, P A; Zensus, J A; Anderson, J M; Bach, U; Jauncey, D L; Ghigo, F; Ghosh, T; Kraus, A; Kovalev, Yu A; Lisakov, M M; Petrov, L Yu; Romney, J D; Salter, C J; Sokolovsky, K V

    2016-01-01

    Inverse Compton cooling limits the brightness temperature of the radiating plasma to a maximum of $10^{11.5}$ K. Relativistic boosting can increase its observed value, but apparent brightness temperatures much in excess of $10^{13}$ K are inaccessible using ground-based very long baseline interferometry (VLBI) at any wavelength. We present observations of the quasar 3C273, made with the space VLBI mission RadioAstron on baselines up to 171,000 km, which directly reveal the presence of angular structure as small as 26 $\\mu$as (2.7 light months) and brightness temperature in excess of $10^{13}$ K. These measurements challenge our understanding of the non-thermal continuum emission in the vicinity of supermassive black holes and require much higher jet speeds than are observed.

  2. Analysis of a tungsten sputtering experiment in DIII-D and code/data validation of high redeposition/reduced erosion

    Energy Technology Data Exchange (ETDEWEB)

    Brooks, J.N., E-mail: brooksjn@purdue.edu [Purdue University, West Lafayette, IN (United States); Elder, J.D. [University of Toronto Institute for Aerospace Studies, Toronto (Canada); McLean, A.G. [Lawrence Livermore National Laboratory, Livermore, CA (United States); Rudakov, D.L. [University of California San Diego, San Diego, CA (United States); Stangeby, P.C. [University of Toronto Institute for Aerospace Studies, Toronto (Canada); Wampler, W.R. [Sandia National Laboratories, Albuquerque, NM (United States)

    2015-05-15

    We analyze a DIII-D tokamak experiment where two tungsten spots on the removable DiMES divertor probe were exposed to 12 s of attached plasma conditions, with moderate strike point temperature and density (∼20 eV, ∼4.5 × 10{sup 19} m{sup −3}), and 3% carbon impurity content. Both very small (1 mm diameter) and small (1 cm diameter) deposited samples were used for assessing gross and net tungsten sputtering erosion. The analysis uses a 3-D erosion/redeposition code package (REDEP/WBC), with input from a diagnostic-calibrated near-surface plasma code (OEDGE), and with focus on charge state resolved impinging carbon ion flux and energy. The tungsten surfaces are primarily sputtered by the carbon, in charge states +1 to +4. We predict high redeposition (∼75%) of sputtered tungsten on the 1 cm spot—with consequent reduced net erosion—and this agrees well with post-exposure DiMES probe RBS analysis data. This study and recent related work is encouraging for erosion lifetime and non-contamination performance of tokamak reactor high-Z plasma facing components.

  3. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

    Science.gov (United States)

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-01-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

  4. Colored and transparent oxide thin films prepared by magnetron sputtering: the glass blower approach.

    Science.gov (United States)

    Gil-Rostra, Jorge; Chaboy, Jesús; Yubero, Francisco; Vilajoana, Antoni; González-Elipe, Agustín R

    2013-03-01

    This work describes the reactive magnetron sputtering processing at room temperature of several mixed oxide MxSiyOz thin films (M: Fe, Ni, Co, Mo, W, Cu) intended for optical, coloring, and aesthetic applications. Specific colors can be selected by adjusting the plasma gas composition and the Si-M ratio in the magnetron target. The microstructure and chemistry of the films are characterized by a large variety of techniques including X-ray photoemission spectroscopy, X-ray absorption spectroscopy (XAS), and infrared spectroscopy, while their optical properties are characterized by UV-vis transmission and reflection analysis. Particularly, XAS analysis of the M cations in the amorphous thin films has provided valuable information about their chemical state and local structure. It is concluded that the M cations are randomly distributed within the SiO2 matrix and that both the M concentration and its chemical state are the key parameters to control the final color of the films.

  5. Toroidally Asymmetric Distributions of Hydrocarbon (CD) Emission and Chemical Sputtering Sources in DIII-D

    Energy Technology Data Exchange (ETDEWEB)

    Groth, M; Brooks, N H; Fenstermacher, M E; Lasnier, C J; McLean, A G; Watkins, J G

    2006-05-16

    Measurements in DIII-D show that the carbon chemical sputtering sources along the inner divertor and center post are toroidally periodic and highest at the upstream tile edge. Imaging with a tangentially viewing camera and visible spectroscopy were used to monitor the emission from molecular hydrocarbons (CH/CD) at 430.8 nm and deuterium neutrals in attached and partially detached divertors of low-confinement mode plasmas. In contrast to the toroidally periodic CD distribution, emission from deuterium neutrals was observed to be toroidally symmetric along the inner strike zone. The toroidal distribution of the measured tile surface temperature in the inner divertor correlates with that of the CD emission, suggesting larger parallel particle and heat fluxes to the upstream tile edge, either due to toroidal tile gaps or height steps between adjacent tiles.

  6. High performance ZnO:Al films deposited on PET substrates using facing target sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Guo, Tingting [Solar Film Laboratory, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191 (China); Dong, Guobo, E-mail: wavedong@buaa.edu.cn [Solar Film Laboratory, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191 (China); Gao, Fangyuan; Xiao, Yu [Solar Film Laboratory, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191 (China); Chen, Qiang [Key Laboratory of Micro-nano Measurement-Manipulation and Physics (Ministry of Education), School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191 (China); Diao, Xungang [Solar Film Laboratory, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191 (China)

    2013-10-01

    ZnO:Al (ZAO) thin films have been deposited on flexible PET substrates using a plasma damage-free facing target sputtering system at room temperature. The structure, surface morphology, electrical and optical properties were investigated as a function of working power. All the samples have a highly preferred orientation of the c-axis perpendicular to the PET substrate and have a high quality surface. With increased working power, the carrier concentration changes slightly, the mobility increases at the beginning and decreases after it reaches a maximum value, in line with electrical conductivity. The figure of merit has been significantly improved with increasing of the working power. Under the optimized condition, the lowest resistivity of 1.3 × 10{sup −3} Ω cm with a sheet resistance of 29 Ω/□ and the relative visible transmittance above 93% in the visible region were obtained.

  7. Operation of a Segmented Hall Thruster with Low-sputtering Carbon-velvet Electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Raitses, Y.; Staack, D.; Dunaevsky, A.; Fisch, N.J.

    2005-12-01

    Carbon fiber velvet material provides exceptional sputtering resistance properties exceeding those for graphite and carbon composite materials. A 2 kW Hall thruster with segmented electrodes made of this material was operated in the discharge voltage range of 200–700 V. The arcing between the floating velvet electrodes and the plasma was visually observed, especially, during the initial conditioning time, which lasted for about 1 h. The comparison of voltage versus current and plume characteristics of the Hall thruster with and without segmented electrodes indicates that the magnetic insulation of the segmented thruster improves with the discharge voltage at a fixed magnetic field. The observations reported here also extend the regimes wherein the segmented Hall thruster can have a narrower plume than that of the conventional nonsegmented thruster.

  8. Study of Three-Dimensional Image Brightness Loss in Stereoscopy

    Directory of Open Access Journals (Sweden)

    Hsing-Cheng Yu

    2015-10-01

    Full Text Available When viewing three-dimensional (3D images, whether in cinemas or on stereoscopic televisions, viewers experience the same problem of image brightness loss. This study aims to investigate image brightness loss in 3D displays, with the primary aim being to quantify the image brightness degradation in the 3D mode. A further aim is to determine the image brightness relationship to the corresponding two-dimensional (2D images in order to adjust the 3D-image brightness values. In addition, the photographic principle is used in this study to measure metering values by capturing 2D and 3D images on television screens. By analyzing these images with statistical product and service solutions (SPSS software, the image brightness values can be estimated using the statistical regression model, which can also indicate the impact of various environmental factors or hardware on the image brightness. In analysis of the experimental results, comparison of the image brightness between 2D and 3D images indicates 60.8% degradation in the 3D image brightness amplitude. The experimental values, from 52.4% to 69.2%, are within the 95% confidence interval

  9. Oxidation Behaviour of Sputtered Ni-3Cr-20Al Alloy

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    The oxidation behavior of sputtered Ni-3Cr-20Al coating at 900°C in air was investigated. A dense Al2O3 layer was formed on the sputtered Ni-3Cr-20Al coating after 200 h oxidation.However, owing to the segregation of Ni3Al during oxidation Focess at high temperature, the spinel NiAl2O4 was also formed in the Al2O3 layer. It was found that the formation of NiAl2O4had no detrimental effect on the oxidation resistance of the sputtered Ni-3Cr-20Al coating due to the excellent adhesion shown by the Al2O3 and NiAl2O4 complex oxide scale.

  10. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    P Samarasekara; N U S Yapa; N T R N Kumara; M V K Perera

    2007-04-01

    For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO2 gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8.5 mbar for 18 h. Argon and oxygen gases were used as sputtering and reactive gases, respectively. ZnO phase could be crystallized using a pure metal target of zinc. The structure of the films determined by means of X-ray diffraction method indicates that the zinc oxide single phase can be fabricated in this substrate temperature range. The sensitivity of the film synthesized at substrate temperature of 130°C is 2.17 in the presence of CO2 gas at a measuring temperature of 100°C.

  11. Alloying of metal nanoparticles by ion-beam induced sputtering

    Science.gov (United States)

    Magudapathy, P.; Srivastava, S. K.; Gangopadhyay, P.; Amirthapandian, S.; Saravanan, K.; Das, A.; Panigrahi, B. K.

    2017-01-01

    Ion-beam sputtering technique has been utilized for controlled synthesis of metal alloy nanoparticles of compositions that can be tuned. Analysis of various experimental results reveals the formation of Ag-Cu alloy nanoparticles on a silica substrate. Surface-plasmon optical resonance positions and observed shifts of Ag Bragg angles in X-ray diffraction pattern particularly confirm formation of alloy nanoparticles on glass samples. Sputtering induced nano-alloying mechanism has been discussed and compared with thermal mixing of Ag and Cu thin films on glass substrates. Compositions and sizes of alloy nanoparticles formed during ion-beam induced sputtering are found to exceed far from the values of thermal mixing.

  12. Oxygen Recovery in Hf Oxide Films Fabricated by Sputtering

    Institute of Scientific and Technical Information of China (English)

    JIANG Ran; LI Zi-Feng

    2009-01-01

    The chemical structure of ultrathin Hf oxide films (< 10 nm) fabricated by a standard sputtering method is investigated using x-ray spectroscopy and Rutherford backscattering spectroscopy. According to the experiments,oxygen species are impacted to the HfO2/Si interface during the initial sputtering, and then released back to the upper Hf02 region driven by the oxygen concentration grads. A vacuum annealing can greatly enhance this recovery process. Additionally, significant SiO2 reduction in the interface is observed after the vacuum annealing for the thick HfO2 films in our experiment. It might be an effective method to confine the interracial layer thickness by sputtering thick HfO2 in no-oxygen ambient.

  13. Larger Planet Radii Inferred from Stellar "Flicker" Brightness Variations of Bright Planet Host Stars

    CERN Document Server

    Bastien, Fabienne A; Pepper, Joshua

    2014-01-01

    Most extrasolar planets have been detected by their influence on their parent star, typically either gravitationally (the Doppler method) or by the small dip in brightness as the planet blocks a portion of the star (the transit method). Therefore, the accuracy with which we know the masses and radii of extrasolar planets depends directly on how well we know those of the stars, the latter usually determined from the measured stellar surface gravity, logg. Recent work has demonstrated that the short-timescale brightness variations ("flicker") of stars can be used to measure logg to a high accuracy of ~0.1-0.2 dex (Bastien et al. 2013). Here, we use flicker measurements of 289 bright (Kepmag<13) candidate planet-hosting stars with Teff=4500-6650 K to re-assess the stellar parameters and determine the resulting impact on derived planet properties. This re-assessment reveals that for the brightest planet-host stars, an astrophysical bias exists that contaminates the stellar sample with evolved stars: nearly 50%...

  14. Mechanical and structural properties of sputtered Ni/Ti multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Senthil Kumar, M.; Boeni, P.; Tixier, S.; Clemens, D.; Horisberger, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1997-09-01

    Ni/Ti bilayers have been prepared by dc-magnetron sputtering in order to study their mechanical and structural properties. A remarkable reduction of stress is observed when the Ni layers are sputtered reactively in argon with a high partial pressure of air. The high angle x-ray diffraction studies show a tendency towards amorphisation of the Ni layers with increasing air flow. The low angle measurements indicate a substantial reduction of interdiffusion resulting in smoother interfaces with increasing air content. (author) 2 figs., 2 refs.

  15. Raman imaging of biofilms using gold sputtered fiber optic probes

    Science.gov (United States)

    Christopher, Christina Grace Charlet; Manoharan, Hariharan; Subrahmanyam, Aryasomayajula; Sai, V. V. Raghavendra

    2016-12-01

    In this work we report characterization of bacterial biofilm using gold sputtered optical fiber probe as substrates for confocal Raman spectroscopy measurements. The chemical composition and the heterogeneity of biofilms in the extracellular polymeric substances (EPS) was evaluated. The spatial distribution of bacterial biofilm on the substrates during their growth phase was studied using Raman imaging. Further, the influence of substrate's surface on bacterial adhesion was investigated by studying growth of biofilms on surfaces with hydrophilic and hydrophobic coatings. This study validates the use of gold sputtered optical fiber probes as SERS substrates in confocal microscopic configuration to identify and characterize clinically relevant biofilms.

  16. A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al{sup +} ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Philipp, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

    2015-09-15

    A metal ion source prototype has been developed: a combination of magnetron sputter technology with 2.45 GHz electron cyclotron resonance (ECR) ion source technology—a so called magnetron ECR ion source (MECRIS). An integrated ring-shaped sputter magnetron with an Al target is acting as a powerful metal atom supply in order to produce an intense current of singly charged metal ions. Preliminary experiments show that an Al{sup +} ion current with a density of 167 μA/cm{sup 2} is extracted from the source at an acceleration voltage of 27 kV. Spatially resolved double Langmuir probe measurements and optical emission spectroscopy were used to study the plasma states of the ion source: sputter magnetron, ECR, and MECRIS plasma. Electron density and temperature as well as Al atom density were determined as a function of microwave and sputter magnetron power. The effect of ECR heating is strongly pronounced in the center of the source. There the electron density is increased by one order of magnitude from 6 × 10{sup 9} cm{sup −3} to 6 × 10{sup 10} cm{sup −3} and the electron temperature is enhanced from about 5 eV to 12 eV, when the ECR plasma is ignited to the magnetron plasma. Operating the magnetron at constant power, it was observed that its discharge current is raised from 1.8 A to 4.8 A, when the ECR discharge was superimposed with a microwave power of 2 kW. At the same time, the discharge voltage decreased from about 560 V to 210 V, clearly indicating a higher plasma density of the MECRIS mode. The optical emission spectrum of the MECRIS plasma is dominated by lines of excited Al atoms and shows a significant contribution of lines arising from singly ionized Al. Plasma emission photography with a CCD camera was used to prove probe measurements and to identify separated plasma emission zones originating from the ECR and magnetron discharge.

  17. Modular Zero Energy. BrightBuilt Home

    Energy Technology Data Exchange (ETDEWEB)

    Aldrich, Robb [Consortium for Advanced Residential Buildings (CARB), Norwalk, CT (United States). Steven Winters Associates, Inc.; Butterfield, Karla [Consortium for Advanced Residential Buildings (CARB), Norwalk, CT (United States). Steven Winters Associates, Inc.

    2016-03-01

    Kaplan Thompson Architects (KTA) has specialized in sustainable, energy-efficient buildings, and they have designed several custom, zero-energy homes in New England. These zero-energy projects have generally been high-end, custom homes with budgets that could accommodate advanced energy systems. In an attempt to make zero energy homes more affordable and accessible to a larger demographic, KTA explored modular construction as way to provide high-quality homes at lower costs. In the mid-2013, KTA formalized this concept when they launched BrightBuilt Home (BBH). The BBH mission is to offer a line of architect-designed, high-performance homes that are priced to offer substantial savings off the lifetime cost of a typical home and can be delivered in less time. For the past two years, CARB has worked with BBH and Keiser Homes (the primary modular manufacturer for BBH) to discuss challenges related to wall systems, HVAC, and quality control. In Spring of 2014, CARB and BBH began looking in detail on a home to be built in Lincolnville, ME by Black Bros. Builders. This report details the solution package specified for this modular plan and the challenges that arose during the project.

  18. GOMOS bright limb ozone data set

    Directory of Open Access Journals (Sweden)

    S. Tukiainen

    2015-01-01

    Full Text Available We have created a daytime ozone profile data set from the measurements of the Global Ozone Monitoring by Occultation of Stars (GOMOS instrument on board the Envisat satellite. This so-called GOMOS bright limb (GBL data set contains ~ 358 000 stratospheric daytime ozone profiles measured by GOMOS in 2002–2012. The GBL data set complements the widely used GOMOS night-time data based on stellar occultation measurements. The GBL data set is based on the GOMOS daytime occultations but instead of the transmitted star light, we use limb scattered solar light. The ozone profiles retrieved from these radiance spectra cover 18–60 km tangent height range and have approximately 2–3 km vertical resolution. We show that these profiles are generally in better than 10% agreement with the NDACC (Network for the Detection of Atmospheric Composition Change ozone sounding profiles and with the GOMOS night-time, MLS (Microwave Limb Sounder, and OSIRIS (Optical Spectrograph, and InfraRed Imaging System satellite measurements. However, there is a 10–13% negative bias at 40 km tangent height and a 10–50% positive bias at 50 km when the solar zenith angle > 75°. These biases are most likely caused by stray light which is difficult to characterize and remove entirely from the measured spectra. Nevertheless, the GBL data set approximately doubles the amount of useful GOMOS ozone profiles and improves coverage of the summer pole.

  19. Mechanical electrodeposition of bright nanocrystalline nickel

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    A new mechanical electrodeposition technology was proposed, and nanocrystalline nickel deposit with bright and smooth surface was prepared in the bath without any additive agents. Unlike traditional methods, the novel technology employed dynamical hard particles to continuously polish the cathode surface and disturb the nearby solution during electrodepositing. Experimental results showed that the polishing effect of hard particles can effectively prevent the hydrogen bubbles and impurities from adhering on the deposit surface and avoid the production of pits, pinholes and nodules. Furthermore, comparing with the deposit prepared by traditional methods, the one prepared by the novel technology was substantially refined with grain size ranging from 30 to 80 nm. Every diffraction peak’s intensity of the deposit was reduced, the preferential orientation degree of (200) decreased and those of (111) and (220) increased. The microhardness notably increased. The magnetic properties were also changed with decreased saturation magnetization and increased coercive force. It was also found that variation of current density and cathode rotational speed could affect the structure and properties of the nickel deposits prepared by this technology.

  20. The Los Alamos high-brightness photoinjector

    Energy Technology Data Exchange (ETDEWEB)

    O' Shea, P.G.

    1991-01-01

    For a number of years Los Alamos National Laboratory has been developing photocathode RF guns for high-brightness electron beam applications such as free-electron lasers (FELs). Previously thermionic high-voltage guns have been the source of choice for the electron accelerators used to drive FELs. The performance of such FELs is severely limited by the emittance growth produced by the subharmonic bunching process and also by the low peak current of the source. In a photoinjector, a laser driven photocathode is placed directly in a high-gradient RF accelerating cavity. A photocathode allows unsurpassed control over the current, and the spatial and temporal profile of the beam. In addition the electrodeless emission'' avoids many of the difficulties associated with multi-electrode guns, i.e. the electrons are accelerated very rapidly to relativistic energies, and there are no electrodes to distort the accelerating fields. For the past two years we have been integrating a photocathode into our existing FEL facility by replacing our thermionic gun and subharmonic bunchers with a high-gradient 1.3 GHz photoinjector. The photoinjector, which is approximately 0.6 m in length, produces 6 MeV, 300 A, 15 ps linac, and accelerated to a final energy of 40 MeV. We have recently begun lasing at wavelengths near 3 {mu}m. 16 refs., 2 figs., 5 tabs.

  1. Study of the Active Screen Plasma Nitriding

    Institute of Scientific and Technical Information of China (English)

    Zhao Cheng; C. X. Li; H. Dong; T. Bell

    2004-01-01

    Active screen plasma nitriding (ASPN) is a novel nitriding process, which overcomes many of the practical problems associated with the conventional DC plasma nitriding (DCPN). Experimental results showed that the metallurgical characteristics and hardening effect of 722M24 steel nitrided by ASPN at both floating potential and anodic (zero) potential were similar to those nitrided by DCPN. XRD and high-resolution SEM analysis indicated that iron nitride particles with sizes in sub-micron scale were deposited on the specimen surface in AS plasma nitriding. These indicate that the neutral iron nitride particles, which are sputtered from the active screen and transferred through plasma to specimen surface, are considered to be the dominant nitrogen carder in ASPN. The OES results show that NH could not be a critical species in plasma nitriding.

  2. Spatial Model of Sky Brightness Magnitude in Langkawi Island, Malaysia

    Science.gov (United States)

    Redzuan Tahar, Mohammad; Kamarudin, Farahana; Umar, Roslan; Khairul Amri Kamarudin, Mohd; Hazmin Sabri, Nor; Ahmad, Karzaman; Rahim, Sobri Abdul; Sharul Aikal Baharim, Mohd

    2017-03-01

    Sky brightness is an essential topic in the field of astronomy, especially for optical astronomical observations that need very clear and dark sky conditions. This study presents the spatial model of sky brightness magnitude in Langkawi Island, Malaysia. Two types of Sky Quality Meter (SQM) manufactured by Unihedron are used to measure the sky brightness on a moonless night (or when the Moon is below the horizon), when the sky is cloudless and the locations are at least 100 m from the nearest light source. The selected locations are marked by their GPS coordinates. The sky brightness data obtained in this study were interpolated and analyzed using a Geographic Information System (GIS), thus producing a spatial model of sky brightness that clearly shows the dark and bright sky areas in Langkawi Island. Surprisingly, our results show the existence of a few dark sites nearby areas of high human activity. The sky brightness of 21.45 mag arcsec{}-2 in the Johnson-Cousins V-band, as the average of sky brightness equivalent to 2.8 × {10}-4{cd} {{{m}}}-2 over the entire island, is an indication that the island is, overall, still relatively dark. However, the amount of development taking place might reduce the number in the near future as the island is famous as a holiday destination.

  3. Brightness limitations of cold field emitters caused by Coulomb interactions

    NARCIS (Netherlands)

    Cook, B.J.; Verduin, T.; Hagen, C.W.; Kruit, P.

    2010-01-01

    Emission theory predicts that high brightness cold field emitters can enhance imaging in the electron microscope. This (neglecting chromatic aberration) is because of the large (coherent) probe current available from a high brightness source and is based on theoretically determined values of reduced

  4. Surface photometry of bulge dominated low surface brightness galaxies

    NARCIS (Netherlands)

    Beijersbergen, M; de Blok, WJG; van der Hulst, JM

    1999-01-01

    We present results of broad band BVRI observations of a sample of galaxies with a low surface brightness (LSB) disk and a bulge. These galaxies are well described as exponential disks and exponential bulges with no preferred value for either scale length or central surface brightness. The median B b

  5. Lamp spectrum and spatial brightness at photopic levels

    DEFF Research Database (Denmark)

    Fotios, Steve; Atli, Deniz; Cheal, Chris

    2015-01-01

    Light sources are available in a variety of spectral power distributions (SPDs) and this affects spatial brightness in a manner not predicted by quantities such as illuminance. Tuning light source SPD to better match the sensitivity of visual perception may allow the same spatial brightness but a...

  6. Analysis of Bright Harvest Remote Analysis for Residential Solar Installations

    Energy Technology Data Exchange (ETDEWEB)

    Nangle, John [National Renewable Energy Lab. (NREL), Golden, CO (United States); Simon, Joseph [National Renewable Energy Lab. (NREL), Golden, CO (United States)

    2015-06-17

    Bright Harvest provides remote shading analysis and design products for residential PV system installers. The National Renewable Energy Laboratory (NREL) through the NREL Commercialization Assistance Program, completed comparative assessments between on-site measurements and remotely calculated values to validate the accuracy of Bright Harvest’s remote shading and power generation.

  7. Sputter deposition of rare earth doped zinc sulfide for near infrared electroluminescence

    Science.gov (United States)

    Glass, William Robert, III

    2003-10-01

    Near infrared emitting alternating current thin film electroluminescent (ACTFEL) phosphors were fabricated by simultaneous R.F. magnetron sputtering from both a target of doped ZnS and an undoped ZnS target. The intensities of both near infrared (NIR) and visible emission from ZnS doped with thulium (Tm), neodymium (Nd), or erbium (Er) fluorides were dependent on deposition parameters such as target duty cycle (varied from 25 to 100% independently for the two targets) and substrate temperature (140--180°C), with lower temperatures giving 400% better NIR brightness. By optimizing the rare earth concentration between 0.8 and 1.1 at%, the near infrared irradiance was improved by 400% for each dopant. The increase in brightness and optimal concentrations are attributed to decreased crystallinity and increased dopant interaction at higher rare earth concentrations. The brightness increase with decreasing deposition temperature was attributed to a reduction of thermal desorption of the ZnS during deposition, and consequently thicker films and optimized rare earth concentration. Luminescent decay lifetimes were short (20--40 musec) because of a high concentration of non-radiative pathways due to defects from the strain of the large rare earth ions on the ZnS lattice. The threshold voltage for visible and near infrared emission was identical despite emission of NIR and visible light resulting from electrons relaxing from low and high energy excited levels, respectively. The optical threshold voltages were identical to the electrical threshold voltages, and it was concluded that at the voltages necessary for electrical breakdown, the accelerated electrons had enough energy to excite either the visible or NIR emitting levels. Phosphors doped with Nd exhibited increased internal charge at higher dopant concentrations despite a reduction in phosphor field (i.e. reduced applied voltage) In contrast; the charge did not change appreciably for Er and decreased for Tm doped films

  8. Influence of Oxygen in Sputtering and Annealing Processes on Properties of ZnO:Ag Films Deposited by rf Sputtering

    Institute of Scientific and Technical Information of China (English)

    DUAN Li; GAO Wei

    2011-01-01

    ZnO:Ag films were prepared by rf sputtering on Si substrates.A detailed study on as-grown and annealed films was carried out using x-ray diffraction(XRD).The results indicate that the film crystalline quality and the Ag doping efficiency were both influenced by oxygen in the sputtering and annealing atmosphere.The optimum conditions are found. Ultraviolet and green emissions of annealed ZnO:Ag films were observed at room temperature.Photoluminescence results show that oxygen in annealing atmosphere reduces the deep-level defects in ZnO:Ag and increases the film quality .

  9. Study of the chemical sputtering in Tore-Supra; Etude de l'erosion chimique dans le tokamak Tore-Supra

    Energy Technology Data Exchange (ETDEWEB)

    Cambe, A

    2002-06-28

    The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C{sub 2}D{sub x} and C{sub 3}D{sub y}) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD{sub 4} (Y{sub CD4}) is highly flux ({phi}) dependent, showing a variation of the form: Y{sub CD4} {proportional_to} {phi}{sup -0.23}. The experimental study also reveals that an increase of the surface temperature induces an augmentation of Y{sub CD4}. The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, {mu}m wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 {mu}m of tungsten. (author)

  10. Interpreting Central Surface Brightness and Color Profiles in Elliptical Galaxies

    Science.gov (United States)

    Silva, David R.; Wise, Michael W.

    1996-01-01

    Hubble Space Telescope imagery has revealed dust features in the central regions of many (50%--80%) nearby bright elliptical galaxies. If these features are an indication of an underlying smooth diffuse dust distribution, then the interpretation of central surface brightness and color profiles in elliptical galaxies becomes significantly more difficult. In this Letter, diagnostics for constraining the presence of such an underlying central dust distribution are presented. We show that easily detectable central color gradients and flattened central surface brightness profiles can be induced by even small amounts of smoothly distributed dust (~100 M⊙). Conversely, combinations of flat surface brightness profiles and flat color gradients or steep surface brightness profiles and steep color gradients are unlikely to be caused by dust. Taken as a whole, these results provide a simple observational tautology for constraining the existence of smooth diffuse dust distributions in the central regions of elliptical galaxies.

  11. A Multi-Wavelength Study of the High Surface Brightness Hotspot in PKS1421-490

    CERN Document Server

    Godfrey, L E H; Lovell, J E J; Jauncey, D L; Gelbord, J; Schwartz, D A; Marshall, H L; Birkinshaw, M; Georganopoulos, M; Murphy, D W; Perlman, E S; Worrall, D M

    2009-01-01

    Long Baseline Array imaging of the z=0.663 broad line radio galaxy PKS1421-490 reveals a 400 pc diameter high surface brightness hotspot at a projected distance of approximately 40kpc from the active galactic nucleus. The isotropic X-ray luminosity of the hotspot, L_{2-10 keV} = 3 10^{44} ergs/s, is comparable to the isotropic X-ray luminosity of the entire X-ray jet of PKS0637-752, and the peak radio surface brightness is hundreds of times greater than that of the brightest hotspot in Cygnus A. We model the radio to X-ray spectral energy distribution using a one-zone synchrotron self Compton model with a near equipartition magnetic field strength of 3 mG. There is a strong brightness asymmetry between the approaching and receding hotspots and the hot spot spectrum remains flat (alpha ~ 0.5) well beyond the predicted cooling break for a 3 mG magnetic field, indicating that the hotspot emission may be Doppler beamed. A high plasma velocity beyond the terminal jet shock could be the result of a dynamically impo...

  12. Adapting High Brightness Relativistic Electron Beams for Ultrafast Science

    Science.gov (United States)

    Scoby, Cheyne Matthew

    This thesis explores the use of ultrashort bunches generated by a radiofrequency electron photoinjector driven by a femtosecond laser. Rf photoinjector technology has been developed to generate ultra high brightness beams for advanced accelerators and to drive advanced light source applications. The extremely good quality of the beams generated by this source has played a key role in the development of 4th generation light sources such as the Linac Coherent Light Source, thus opening the way to studies of materials science and biological systems with high temporal and spatial resolution. At the Pegasus Photoinjector Lab, we have developed the application of a BNL/SLAC/UCLA 1.6-cell rf photoinjector as a tool for ultrafast science in its own right. It is the aim of this work to explore the generation of ultrashort electron bunches, give descriptions of the novel ultrafast diagnostics developed to be able to characterize the electron bunch and synchronize it with a pump laser, and share some of the scientific results that were obtained with this technology at the UCLA Pegasus laboratory. This dissertation explains the requirements of the drive laser source and describes the principles of rf photoinjector design and operation necessary to produce electron bunches with an rms longitudinal length < 100 femtoseconds containing 107 - 108 electrons per bunch. In this condition, when the laser intensity is sufficiently high, multiphoton photoemission is demonstrated to be more efficient in terms of charge yield than single photon photoemission. When a short laser pulse hits the cathode the resulting beam dynamics are dominated by a strong space charge driven longitudinal expansion which leads to the creation of a nearly ideal uniformly filled ellipsoidal distribution. These beam distributions are characterized by linear space charge forces and hence by high peak brightness and small transverse emittances. This regime of operation of the RF photoinjector is also termed the

  13. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information.

    Science.gov (United States)

    Wang, Zhaoying; Liu, Bingwen; Zhao, Evan W; Jin, Ke; Du, Yingge; Neeway, James J; Ryan, Joseph V; Hu, Dehong; Zhang, Kelvin H L; Hong, Mina; Le Guernic, Solenne; Thevuthasan, Suntharampilai; Wang, Fuyi; Zhu, Zihua

    2015-08-01

    The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass (SON68) and layered hole-perovskite oxide thin films were selected as model systems because of their fundamental and practical significance. Our results show that high sputter rates and accurate interfacial information can be achieved simultaneously for argon cluster sputtering, whereas this is not the case for cesium and oxygen sputtering. Therefore, the implementation of an argon cluster sputtering source can significantly improve the analysis efficiency of insulating materials and, thus, can expand its applications to the study of glass corrosion, perovskite oxide thin film characterization, and many other systems of interest.

  14. 2D edge plasma modeling extended up to the main chamber

    Energy Technology Data Exchange (ETDEWEB)

    Dekeyser, W., E-mail: wouter.dekeyser@mech.kuleuven.be [Department of Mechanical Engineering, Katholieke Universiteit Leuven, Celestijnenlaan 300A, 3001 Leuven (Belgium); Baelmans, M. [Department of Mechanical Engineering, Katholieke Universiteit Leuven, Celestijnenlaan 300A, 3001 Leuven (Belgium); Reiter, D.; Boerner, P.; Kotov, V. [Institut fuer Plasmaphysik, Forschungszentrum Juelich GmbH, EURATOM-Association, Trilateral Euregio Cluster, D-52425 Juelich (Germany)

    2011-08-01

    Far SOL plasma flow, and hence main chamber recycling and plasma surface interaction, are today still only very poorly described by current 2D fluid edge codes, such as B2, UEDGE or EDGE2D, due to a common technical limitation. We have extended the B2 plasma fluid solver in the current ITER version of B2-EIRENE (SOLPS4.3) to allow plasma solutions to be obtained up to the 'real vessel wall', at least on the basis of ad hoc far SOL transport models. We apply here the kinetic Monte Carlo Code EIRENE on such plasma solutions to study effects of this model refinement on main chamber fluxes and sputtering, for an ITER configuration. We show that main chamber sputtering may be significantly modified both due to thermalization of CX neutrals in the far SOL and poloidally highly asymmetric plasma wall contact, as compared to hitherto applied teleportation of particle fluxes across this domain.

  15. Sputtering of solid deuterium by He-ions

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Pedrys, R.

    2001-01-01

    Sputtering of solid deuterium by bombardment of 3He+ and 4He+ ions was studied. Some features are similar to hydrogen ion bombardment of solid deuterium, but for the He-ions a significant contribution of elastic processes to the total yield can be identified. The thin-film enhancement is more...

  16. Sputtering of solid neon by keV hydrogen ions

    DEFF Research Database (Denmark)

    Ellegaard, Ole; Schou, Jørgen; Sørensen, H.

    1986-01-01

    Sputtering of solid Ne with the hydrogen ions H+1, H+2 and H+3 in the energy range 1–10 keV/atom has been studied by means of a quartz microbalance technique. No enhancement in the yield per atom for molecular ions was found. The results for hydrogen ions are compared with data for keV electrons....

  17. Sputtered thin films for high density tape recording

    NARCIS (Netherlands)

    Nguyen, L.T.

    2004-01-01

    This thesis describes the investigation of sputtered thin film media for high density tape recording. As discussed in Chapter 1, to meet the tremendous demand of data storage, the density of recording tape has to be increased continuously. For further increasing the bit density the key factors are:

  18. Sputtering of Oxygen Ice by Low Energy Ions

    CERN Document Server

    Muntean, E A; Field, T A; Fitzsimmons, A; Hunniford, C A; McCullough, R W

    2015-01-01

    Naturally occurring ices lie on both interstellar dust grains and on celestial objects, such as those in the outer solar system. These ices are continu- ously subjected to irradiation by ions from the solar wind and/or cosmic rays, which modify their surfaces. As a result, new molecular species may form which can be sputtered off into space or planetary atmospheres. We determined the experimental values of sputtering yields for irradiation of oxygen ice at 10 K by singly (He+, C+, N+, O+ and Ar+) and doubly (C2+, N2+ and O2+) charged ions with 4 keV kinetic energy. In these laboratory experiments, oxygen ice was deposited and irradiated by ions in an ultra high vacuum chamber at low temperature to simulate the environment of space. The number of molecules removed by sputtering was observed by measurement of the ice thickness using laser interferometry. Preliminary mass spectra were taken of sputtered species and of molecules formed in the ice by temperature programmed desorption (TPD). We find that the experi...

  19. Production of carbon nanotubes by the magnetron DC sputtering method

    NARCIS (Netherlands)

    Antonenko, SV; Mal'tsev, SN

    2005-01-01

    Carbon films containing multiwall nanotubes were produced by the magnetron de sputtering method. A graphite disc with Y and Ni catalyst plates was used as a target. The structural and morphological properties of the films were investigated using a JEM 2000EXII transmission electron microscope. The f

  20. Oblique sputtered and evaporated magnetic thin films for tape recording

    NARCIS (Netherlands)

    Bijker, Martin D.

    1998-01-01

    After having introduced some aspects of tape recording in chapter one, chapter two deals with the magnetron sputtering process itself. The kinetic energy of the electrons which are bound to the groove region by the combined action of the B and E field, was calculated. It was found that for a magneti

  1. Sodium tungsten bronze thin films by rf sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anderegg, J.W.

    1977-03-01

    Polycrystalline Na/sub x/WO/sub 3/ films were produced by rf sputtering. Films of low x-value resulted when co-sputtering WO/sub 3/ on a Na/sub 0.83/WO/sub 3/ target, and Na/sub 0/./sub 83/ on WO/sub 3/ target. Films of high x and of mixed phase were produced by sputtering a powder mixture of Na/sub 2/WO/sub 4/ and WO/sub 3/ on a tungsten target. Of the sputtering parameters studied, the substrate temperature is the most critical with temperatures above 500/sup 0/C producing films which were cubic in structure with only a small amount of Tetragonal I. The presence of oxygen up to 3 percent by volume had minimal effect on film quality or x-value. Auger, electron microprobe, SIMS, SEM, x-ray diffraction, and sheet resistivity techniques were used in characterizing these films. Resistivity of the films was a factor of 10 higher than the bulk crystalline data for Na/sub 0/./sub 83/WO/sub 3/.

  2. Particle dynamics during electronic sputtering of solid krypton

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    We have modeled electronic sputtering of solid krypton by excimer production with molecular dynamics. Both excimer evolution in the solid and deexcitation processes have been incorporated in the simulation. The excimer dynamics in the lattice has been analyzed: the excimers formed near the surface...

  3. Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

    NARCIS (Netherlands)

    Lisfi, A.; Lodder, J.C.; Wormeester, H.; Poelsema, B.

    2002-01-01

    Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films (f

  4. Some New Views on the Principles of Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHAO Jia-xue; FANG Kai-ming; TONG Hong-hui

    2004-01-01

    In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic confinements in three spatial dimensions on moving charged particles (including electrons) in this kind of non-uniform field. They are the longitudinal cycloidal motion, the horizontal simple harmonic-like motion (with varying amplitudes), and the vertical repelling action. The horizontal magnetic confinement in a mirror-like magnetic field keeps glow discharge lane completely parallel to the corridor of magnetic force lines, therefore only an effectively closed magnet array structure can form a relatively uniform and closed discharge lane. The main reasons for electrons' releasing from magnetic confinement are the vertical magnetic repelling force as well as a more and more weak confinement action in outer range etc. The dominant reasons for a comparatively low increase of substrate's temperature are that the density of bombarding electrons near the substrate is relatively low and their spatial distribution is relatively uniform (compared with that near the target surface). The erosion lane with an inverted Gauss's distribution shape on a magnetron sputtered target is due to that,with sputtering, the distribution width of the critical density of electrons shrinks continuously but the sputtering effect in the centerline of the corridor is always the most powerful.

  5. Dark Skies, Bright Kids! Year 4

    Science.gov (United States)

    Sokal, Kimberly R.; Johnson, K. E.; Barcos-Munoz, L. D.; Beaton, R.; Borish, J.; Crawford, S. B.; Corby, J.; Damke, G.; Dean, J.; Dorsey, G.; Jackson, L.; Liss, S.; Oza, A.; Peacock, S.; Prager, B.; Romero, C.; Sivakoff, G. R.; Walker, L.; Whelan, D. G.; Zucker, C.

    2013-01-01

    Aiming to engage young children's natural excitement and curiosity, the outreach group Dark Skies, Bright Kids (DSBK) brings a hands-on approach to astronomy to elementary schools in Virginia. We hope to enhance children's view and understanding of science while exploring the Universe using fun activities. DSBK focuses on rural and underserved schools in Albemarle County and offers a semester-long astronomy club for third through fifth grade students. We believe regular interactions foster personal relationships between students and volunteers that encourage a life-long interest in science. In our fourth year of hosting clubs, we returned to Ivy Creek Elementary School, where we saw wonderful responses from a special group of students with `low-incidence' disabilities. DSBK has grown to realize a broader reach beyond local astronomy clubs; we hope to ignite a spark of interest in astronomy and science more widely- in more children, their families, and their teachers. We also hosted the Second Annual Central Virginia Star Party with an open invitation to the community to encourage families to enjoy astronomy together. Throughout the year, DSBK now holds 'one-off' programs (akin to astronomy field days) for elementary schools and children's groups throughout Virginia. Furthermore, we are in the final stages of a project to create two bilingual astronomy books called "Snapshots of the Universe", in Spanish and French with English translations. This art book will be made available online and we are working to get a copy in every elementary school in the state. DSBK has begun to reach out to elementary school teachers in order to provide them with useful and engaging classroom material. We have adapted our volunteer-created activities into useful and ready-to-use lessons, available online. After improvements based on research through interactions and feedback from teachers, we have explicitly identified the learning goals in terms of Virginia's Standards of Learning

  6. Dark Skies, Bright Kids: Year 2

    Science.gov (United States)

    Carlberg, Joleen K.; Johnson, K.; Lynch, R.; Walker, L.; Beaton, R.; Corby, J.; de Messieres, G.; Drosback, M.; Gugliucci, N.; Jackson, L.; Kingery, A.; Layman, S.; Murphy, E.; Richardson, W.; Ries, P.; Romero, C.; Sivakoff, G.; Sokal, K.; Trammell, G.; Whelan, D.; Yang, A.; Zasowski, G.

    2011-01-01

    The Dark Skies, Bright Kids (DSBK) outreach program brings astronomy education into local elementary schools in central Virginia's Southern Albemarle County through an after-school club. Taking advantage of the unusually dark night skies in the rural countryside, DSBK targets economically disadvantaged schools that tend to be underserved due to their rural locale. The goals of DSBK are to foster children's natural curiosity, demonstrate that science is a fun and creative process, challenge students' conceptions of what a scientist is and does, and teach some basic astronomy. Furthermore, DSBK works to assimilate families into students' education by holding family observing nights at the school. Now in its third semester, DSBK has successfully run programs at two schools with very diverse student populations. Working with these students has helped us to revise our activities and to create new ones. A by-product of our work has been the development of lesson plans, complete with learning goals and detailed instructions, that we make publically available on our website. This year we are expanding our repertoire with our new planetarium, which allows us to visualize topics in novel ways and supplements family observing on cloudy nights. The DSBK volunteers have also created a bilingual astronomy artbook --- designed, written, and illustrated by UVa students --- that we will publish and distribute to elementary schools in Virginia. Our book debuted at the last AAS winter meeting, and since then it has been extensively revised and updated with input from many individuals, including parents, professional educators, and a children's book author. Because the club is currently limited to serving a few elementary schools, this book will be part of our efforts to broaden our impact by bringing astronomy to schools we cannot go to ourselves and reaching out to Spanish-speaking communities at the same time.

  7. Dark Skies, Bright Kids! Year 3

    Science.gov (United States)

    Whelan, David G.; Johnson, K. E.; Barcos-Munoz, L. D.; Beaton, R. L.; Borish, J.; Corby, J. F.; Dorsey, G.; Gugliucci, N. E.; Prager, B. J.; Ries, P. A.; Romero, C. E.; Sokal, K. R.; Tang, X.; Walker, L. M.; Yang, A. J.; Zasowski, G.

    2012-01-01

    Dark Skies, Bright Kids! (DSBK) is a program that brings astronomy education to elementary schools throughout central Virginia. In a relaxed, out-of-classroom atmosphere, we are able to foster the innate curiosity that young students have about science and the world around them. We target schools that are under-served due to their rural locale or special needs students, demonstrating that science is a fun and creative process to a segment of the population that might not otherwise be exposed to astronomy. Families are included in the learning experience during semi-annual `star parties'. Since last January, we have expanded the breadth and depth of our educational capabilities. We have developed new programs for use in our digital planetarium. We held the first Central Virginia Star Party, providing an atmosphere where local children from multiple schools were able to share their love for astronomy. Local government and University officials were also invited so that they could experience our focused science outreach. Most recently, we have become part of Ivy Creek School's Club Day activities, bringing our program to a new segment of the elementary school system in Albemarle County: those that have `low-incidence' disabilities, requiring special attention. We continue to develop a curriculum for after-school programs that functions as either a series of one-time activities or several months of focused outreach at one school. Many of these activities are provided on our website, http://www.astro.virginia.edu/dsbk/, for the wider astronomical community, including the new planetarium work. We have extended our book project to include two bilingual astronomy books called `Snapshots of the Universe,' one in Spanish and English, the other in French and English. These books introduce young people to some of the many wonders of the Universe through art and captions developed by DSBK volunteers.

  8. Angular distribution of sputtered atoms induced by low-energy heavy ion bombardment

    Institute of Scientific and Technical Information of China (English)

    ZHANG Lai; ZHANG Zhu-Lin

    2004-01-01

    The sputtering yield angular distributions have been calculated based on the ion energy dependence of total sputtering yields for Ni and Motargets bombarded by low-energy Hg+ ion. The calculated curves show excellent agreement with the corresponding Wehner's experimental results of sputtering yield angular distribution. The fact clearly demonstrated the intrinsic relation between the ion energy dependence of total sputtering yields and the sputtering yield angular distribution. This intrinsic relation had been ignored in Yamamura's papers (1981,1982) due to some obvious mistakes.

  9. Bright Times for an Ancient Star

    Science.gov (United States)

    Fuhrmann, K.; Chini, R.

    2017-01-01

    Field stars of Population II are among the oldest sources in the Galaxy. Most of their solar-type dwarfs are non-single and, given their extreme age, a significant fraction is accompanied by stellar remnants. Here we report the discovery of the bright F7V star 49 Lib as a massive and very metal-rich Population II field blue straggler, along with evidence for a white dwarf as its dark and unseen companion. 49 Lib is known as a relatively fast-rotating, single-lined spectroscopic binary in a 3 year orbit and with an apparent age of about τ ≃ 2.3 Gyr. Its chemistry and kinematics, however, both consistently imply that 49 Lib must be an ancient Population II star at τ ≃ 12 Gyr. With reference to the inclination from the astrometric orbit, leading to a {M}{WD}={0.50}-0.04+0.03 M⊙ low-mass white dwarf, and in view of the {M}{BS}={1.55}-0.13+0.07 M⊙ massive, evolved F-type blue straggler star, we demonstrate that 49 Lib must have been the subject of a mostly conservative mass transfer with a near-equal-mass M ≃ 1.06 + 1.00 M⊙ G-type binary at birth. For its future evolution, we point to the possibility as a progenitor system toward a type Ia supernova. Most importantly, however, we note that the remarkable metal enrichment of 49 Lib at [Mg/H] = +0.23 and [Fe/H] = ‑0.11 has principally very relevant implications for the early epoch when the Milky Way came into being.

  10. MAGNETIC FLUX SUPPLEMENT TO CORONAL BRIGHT POINTS

    Energy Technology Data Exchange (ETDEWEB)

    Mou, Chaozhou; Huang, Zhenghua; Xia, Lidong; Li, Bo; Fu, Hui; Jiao, Fangran; Hou, Zhenyong [Shandong Provincial Key Laboratory of Optical Astronomy and Solar-Terrestrial Environment, Institute of Space Sciences, Shandong University, Weihai, 264209 Shandong (China); Madjarska, Maria S., E-mail: z.huang@sdu.edu.cn [Armagh Observatory, College Hill, Armagh BT61 9DG (United Kingdom)

    2016-02-10

    Coronal bright points (BPs) are associated with magnetic bipolar features (MBFs) and magnetic cancellation. Here we investigate how BP-associated MBFs form and how the consequent magnetic cancellation occurs. We analyze longitudinal magnetograms from the Helioseismic and Magnetic Imager to investigate the photospheric magnetic flux evolution of 70 BPs. From images taken in the 193 Å passband of the Atmospheric Imaging Assembly (AIA) we dermine that the BPs’ lifetimes vary from 2.7 to 58.8 hr. The formation of the BP MBFs is found to involve three processes, namely, emergence, convergence, and local coalescence of the magnetic fluxes. The formation of an MBF can involve more than one of these processes. Out of the 70 cases, flux emergence is the main process of an MBF buildup of 52 BPs, mainly convergence is seen in 28, and 14 cases are associated with local coalescence. For MBFs formed by bipolar emergence, the time difference between the flux emergence and the BP appearance in the AIA 193 Å passband varies from 0.1 to 3.2 hr with an average of 1.3 hr. While magnetic cancellation is found in all 70 BPs, it can occur in three different ways: (I) between an MBF and small weak magnetic features (in 33 BPs); (II) within an MBF with the two polarities moving toward each other from a large distance (34 BPs); (III) within an MBF whose two main polarities emerge in the same place simultaneously (3 BPs). While an MBF builds up the skeleton of a BP, we find that the magnetic activities responsible for the BP heating may involve small weak fields.

  11. Operational experience on the generation and control of high brightness electron bunch trains at SPARC-LAB

    Science.gov (United States)

    Mostacci, A.; Alesini, D.; Anania, M. P.; Bacci, A.; Bellaveglia, M.; Biagioni, A.; Cardelli, F.; Castellano, Michele; Chiadroni, Enrica; Cianchi, Alessandro; Croia, M.; Di Giovenale, Domenico; Di Pirro, Giampiero; Ferrario, Massimo; Filippi, Francesco; Gallo, Alessandro; Gatti, Giancarlo; Giribono, Anna; Innocenti, L.; Marocchino, A.; Petrarca, M.; Piersanti, L.; Pioli, S.; Pompili, Riccardo; Romeo, Stefano; Rossi, Andrea Renato; Shpakov, V.; Scifo, J.; Vaccarezza, Cristina; Villa, Fabio; Weiwei, L.

    2015-05-01

    Sub-picosecond, high-brightness electron bunch trains are routinely produced at SPARC-LAB via the velocity bunching technique. Such bunch trains can be used to drive multi-color Free Electron Lasers (FELs) and plasma wake field accelerators. In this paper we present recent results at SPARC-LAB on the generation of such beams, highlighting the key points of our scheme. We will discuss also the on-going machine upgrades to allow driving FELs with plasma accelerated beams or with short electron pulses at an increased energy.

  12. Observation of a periodic runaway in the reactive Ar/O{sub 2} high power impulse magnetron sputtering discharge

    Energy Technology Data Exchange (ETDEWEB)

    Shayestehaminzadeh, Seyedmohammad, E-mail: ses30@hi.is, E-mail: shayesteh@mch.rwth-aachen.de; Arnalds, Unnar B.; Magnusson, Rögnvaldur L.; Olafsson, Sveinn [Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland)

    2015-11-15

    This paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti) with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understood to be the main reason for the runaway occurring periodically. Increasing the pulsing frequency can bring the target back to a metal (or suboxide) mode, and eliminate the periodic transition of the target. Therefore, a pulsing frequency interval is defined for the reactive Ar/O{sub 2} discharge in order to sustain the plasma in a runaway-free mode without exceeding the maximum power that the magnetron can tolerate.

  13. Carbon Back Sputter Modeling for Hall Thruster Testing

    Science.gov (United States)

    Gilland, James H.; Williams, George J.; Burt, Jonathan M.; Yim, John Tamin

    2016-01-01

    Lifetime requirements for electric propulsion devices, including Hall Effect thrusters, are continually increasing, driven in part by NASA's inclusion of this technology in it's exploration architecture. NASA will demonstrate high-power electric propulsion system on the Solar Electric Propulsion Technology Demonstration Mission (SEP TDM). The Asteroid Redirect Robotic mission is one candidate SEP TDM, which is projected to require tens of thousands of thruster life. As thruster life is increased, for example through the use of improved magnetic field designs, the relative influence of facility effects increases. One such effect is the sputtering and redeposition, or back sputter, of facility materials by the high energy thruster plumes. In support of wear testing for the Hall Effect Rocket with Magnetic Shielding (HERMeS) project, the back sputter from a Hall effect thruster plume has been modeled for the NASA Glenn Research Center's Vacuum Facility 5. The predicted wear at a near-worst case condition of 600 V, 12.5 kW was found to be on the order of 1 micron/kh in a fully carbon-lined chamber. A more detailed numerical Monte Carlo code was also modified to estimate back sputter for a detailed facility and pumping configuration. This code demonstrated similar back sputter rate distributions, but is not yet accurately modeling the magnitudes. The modeling has been benchmarked to recent HERMeS wear testing, using multiple microbalance measurements. These recent measurements have yielded values on the order of 1.5 - 2 micron/kh at 600 V and 12.5 kW.

  14. Quantitative Brightness Analysis of Fluorescence Intensity Fluctuations in E. Coli.

    Science.gov (United States)

    Hur, Kwang-Ho; Mueller, Joachim D

    2015-01-01

    The brightness measured by fluorescence fluctuation spectroscopy specifies the average stoichiometry of a labeled protein in a sample. Here we extended brightness analysis, which has been mainly applied in eukaryotic cells, to prokaryotic cells with E. coli serving as a model system. The small size of the E. coli cell introduces unique challenges for applying brightness analysis that are addressed in this work. Photobleaching leads to a depletion of fluorophores and a reduction of the brightness of protein complexes. In addition, the E. coli cell and the point spread function of the instrument only partially overlap, which influences intensity fluctuations. To address these challenges we developed MSQ analysis, which is based on the mean Q-value of segmented photon count data, and combined it with the analysis of axial scans through the E. coli cell. The MSQ method recovers brightness, concentration, and diffusion time of soluble proteins in E. coli. We applied MSQ to measure the brightness of EGFP in E. coli and compared it to solution measurements. We further used MSQ analysis to determine the oligomeric state of nuclear transport factor 2 labeled with EGFP expressed in E. coli cells. The results obtained demonstrate the feasibility of quantifying the stoichiometry of proteins by brightness analysis in a prokaryotic cell.

  15. Quantitative Brightness Analysis of Fluorescence Intensity Fluctuations in E. Coli.

    Directory of Open Access Journals (Sweden)

    Kwang-Ho Hur

    Full Text Available The brightness measured by fluorescence fluctuation spectroscopy specifies the average stoichiometry of a labeled protein in a sample. Here we extended brightness analysis, which has been mainly applied in eukaryotic cells, to prokaryotic cells with E. coli serving as a model system. The small size of the E. coli cell introduces unique challenges for applying brightness analysis that are addressed in this work. Photobleaching leads to a depletion of fluorophores and a reduction of the brightness of protein complexes. In addition, the E. coli cell and the point spread function of the instrument only partially overlap, which influences intensity fluctuations. To address these challenges we developed MSQ analysis, which is based on the mean Q-value of segmented photon count data, and combined it with the analysis of axial scans through the E. coli cell. The MSQ method recovers brightness, concentration, and diffusion time of soluble proteins in E. coli. We applied MSQ to measure the brightness of EGFP in E. coli and compared it to solution measurements. We further used MSQ analysis to determine the oligomeric state of nuclear transport factor 2 labeled with EGFP expressed in E. coli cells. The results obtained demonstrate the feasibility of quantifying the stoichiometry of proteins by brightness analysis in a prokaryotic cell.

  16. Lifetime Calculations on Collector Optics from Laser Plasma Extreme Ultraviolet Sources with Minimum Mass

    Institute of Scientific and Technical Information of China (English)

    WU Tao; WANG Xin-Bing

    2011-01-01

    An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum. According to the ion flux and energy distribution, the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation. The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.%@@ An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum.According to the ion flux and energy distribution,the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation.The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.

  17. Generation and propagation of high-brightness electron beams from a magnetically crowbarred injector

    Science.gov (United States)

    Humphries, S., Jr.; Len, L. K.; Allen, C. B.

    1987-05-01

    Tests of a 300-keV electrostatic electron beam injector with a magnetic crowbar switch are described. The saturable ferrite core switch allows generation of a constant voltage, 80-ns pulse directly from a Marx generator. Inductive isolation in the switch permits direct access to the high-voltage electrode for thermionic or active plasma cathode experiments. The pulse modulator can drive a 1.5-kA load. A high brightness 290-A beam from a felt plasma-emission cathode was extracted and propagated in vacuum. Because of the reliability of the magnetic crowbar switch, more than 500 shots were accumulated on the cathode at over 1 kA/sq cm with no degradation of the output. The output beam had a normalized brightness of 2.6 x 10 to the 8th A/(m rad) sq. A solenoidal lens was used to match the space-charge-dominated beam into a 1-m-long periodic focusing system with 25 reversing solenoidal coils. A beam current of 150 A was successfully transported through the 1.7-cm radius tube.

  18. Variations in the Bivariate Brightness Distribution with different galaxy types

    CERN Document Server

    Cross, N; Lemon, D; Liske, J; Cross, Nicholas; Driver, Simon; Lemon, David; Liske, Jochen

    2002-01-01

    We present Bivariate Brightness Distributions (BBDs) for four spectral types discriminated by the 2dFGRS. We discuss the photometry and completeness of the 2dFGRS using a deep, wide-field CCD imaging survey. We find that there is a strong luminosity-surface brightness correlation amongst galaxies with medium to strong emission features, with gradient $\\beta_{\\mu}=0.25\\pm0.05$ and width $\\sigma_{\\mu}=0.56\\pm0.01$. Strong absorption line galaxies, show a bimodal distribution, with no correlation between luminosity and surface brightness.

  19. Low dimensional neutron moderators for enhanced source brightness

    DEFF Research Database (Denmark)

    Mezei, Ferenc; Zanini, Luca; Takibayev, Alan;

    2014-01-01

    In a recent numerical optimization study we have found that liquid para-hydrogen coupled cold neutron moderators deliver 3–5 times higher cold neutron brightness at a spallation neutron source if they take the form of a flat, quasi 2-dimensional disc, in contrast to the conventional more voluminous...... for cold neutrons. This model leads to the conclusions that the optimal shape for high brightness para-hydrogen neutron moderators is the quasi 1-dimensional tube and these low dimensional moderators can also deliver much enhanced cold neutron brightness in fission reactor neutron sources, compared...

  20. Surface plasma source with saddle antenna radio frequency plasma generator.

    Science.gov (United States)

    Dudnikov, V; Johnson, R P; Murray, S; Pennisi, T; Piller, C; Santana, M; Stockli, M; Welton, R

    2012-02-01

    A prototype RF H(-) surface plasma source (SPS) with saddle (SA) RF antenna is developed which will provide better power efficiency for high pulsed and average current, higher brightness with longer lifetime and higher reliability. Several versions of new plasma generators with small AlN discharge chambers and different antennas and magnetic field configurations were tested in the plasma source test stand. A prototype SA SPS was installed in the Spallation Neutron Source (SNS) ion source test stand with a larger, normal-sized SNS AlN chamber that achieved unanalyzed peak currents of up to 67 mA with an apparent efficiency up to 1.6 mA∕kW. Control experiments with H(-) beam produced by SNS SPS with internal and external antennas were conducted. A new version of the RF triggering plasma gun has been designed. A saddle antenna SPS with water cooling is fabricated for high duty factor testing.

  1. Depth of origin of sputtered atoms: Experimental and theoretical study of Cu/Ru(0001)

    Energy Technology Data Exchange (ETDEWEB)

    Burnett, J.W.; Biersack, J.P.; Gruen, D.M.; Joergensen, B.; Krauss, A.R.; Pellin, M.J.; Schweitzer, E.L.; Yates, J.T. Jr.; Young, C.E.

    1987-01-01

    The depth of origin of sputtered atoms is a subject of considerable interest. The surface sensitivity of analytical techniques such as Secondary Ion Mass Spectrometry (SIMS) and Surface Analysis by Resonance Ionization of Sputtered Atoms (SARISA), and the sputtering properties of strongly segregating alloy systems, are critically dependent on the sputtering depth of origin. A significant discrepancy exists between the predictions of the Sigmund theory and computer sputtering models; in general, the computer models predict a much shallower depth of origin. The existing experimental evidence suggests that most of the sputtered atoms originate in the topmost atomic layer, but until recently, the results have not been definitive. We have experimentally determined the depth of origin of atoms sputtered from surfaces consisting of Cu films of less than two monolayers on a Ru(0001) substrate. The Cu/Ru target was statically sputtered using 3.6 keV Ar/sup +/. The sputtered neutrals were non-resonantly laser ionized and detected using SARISA. The Cu/Ru sputtering yield ratio and the suppression of the Ru sputtering yield were determined for various Cu coverages. The results indicate that the majority of the sputtered atoms originate in the topmost atomic layer. The Cu/Ru system is also modeled using a modified Transport of Ions in Matter (TRIM) code. It was found that TRIM C does not correctly treat the first atomic layer, resulting in a serious underestimate of the number of sputtered atoms which originate in this layer. The corrected version adequately describes the results, predicting that for the experimental conditions roughly two-thirds of the sputtered atoms originate in the first atomic layer. These results are significantly greater than the Sigmund theory estimate of >40%. 26 refs., 3 figs., 1 tab.

  2. Au-nanoparticles grafted on plasma treated PE

    Energy Technology Data Exchange (ETDEWEB)

    Svorcik, V., E-mail: vaclav.svorcik@vscht.c [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Chaloupka, A. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Rezanka, P. [Department of Analytical Chemistry, Institute of Chemical Technology, Prague (Czech Republic); Slepicka, P. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Kolska, Z. [Department of Chemistry, J.E. Purkyne University, 400 96 Usti nad Labem (Czech Republic); Kasalkova, N.; Hubacek, T.; Siegel, J. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)

    2010-03-15

    Polyethylene (PE) surface was treated with Ar plasma. Activated surface was grafted from methanol solution of 1,2-ethanedithiol. Then the sample was immersed into freshly prepared colloid solution of Au-nanoparticles. Finally Au layer was sputtered on the samples. Properties of the modified PE were studied using various methods: AFM, EPR, RBS and nanoindentation. It was shown that the plasma treatment results in degradation of polymer chain (AFM) and creation of free radicals by EPR. After grafting with dithiol, the concentration of free radicals declines. The presence of Au and S in the surface layer after the coating with Au-nanoparticles was proved by RBS. Plasma treatment changes PE surface morphology and increases surface roughness, too. Another significant change in surface morphology and roughness was observed after deposition of Au-nanoparticles. Nanoindentation measurements show that the grafting with Au-nanoparticles increases adhesion of subsequently sputtered Au layer.

  3. Au-nanoparticles grafted on plasma treated PE

    Science.gov (United States)

    Švorčík, V.; Chaloupka, A.; Řezanka, P.; Slepička, P.; Kolská, Z.; Kasálková, N.; Hubáček, T.; Siegel, J.

    2010-03-01

    Polyethylene (PE) surface was treated with Ar plasma. Activated surface was grafted from methanol solution of 1,2-ethanedithiol. Then the sample was immersed into freshly prepared colloid solution of Au-nanoparticles. Finally Au layer was sputtered on the samples. Properties of the modified PE were studied using various methods: AFM, EPR, RBS and nanoindentation. It was shown that the plasma treatment results in degradation of polymer chain (AFM) and creation of free radicals by EPR. After grafting with dithiol, the concentration of free radicals declines. The presence of Au and S in the surface layer after the coating with Au-nanoparticles was proved by RBS. Plasma treatment changes PE surface morphology and increases surface roughness, too. Another significant change in surface morphology and roughness was observed after deposition of Au-nanoparticles. Nanoindentation measurements show that the grafting with Au-nanoparticles increases adhesion of subsequently sputtered Au layer.

  4. Surface compositional changes in GaAs subjected to argon plasma treatment

    Energy Technology Data Exchange (ETDEWEB)

    Surdu-Bob, C.C.; Sullivan, J.L.; Saied, S.O.; Layberry, R.; Aflori, M

    2002-12-30

    X-ray photoelectron spectroscopy (XPS) has been employed to study surface compositional changes in GaAs (1 0 0) subjected to argon plasma treatment. The experimental results have been explained in terms of predicted argon ion energies, measured ion densities and etch rates. A model is proposed for the processes taking place at the surface of GaAs in terms of segregation, sputtering and surface relaxation. Stopping and range of ions in matter (SRIM) code has also been employedan aid to identification of the mechanisms responsible for the compositional changes. Argon plasma treatment induced surface oxidation at very low energies and sputtering and surface damage with increasing energy.

  5. Ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

    Science.gov (United States)

    Lautenschläger, T.; Feder, R.; Neumann, H.; Rice, C.; Schubert, M.; Bundesmann, C.

    2016-10-01

    In the present study, the influence of ion energy and geometrical parameters onto the angular and energy distribution of secondary particles for sputtering a Ti target with Ar ions is investigated. The angular distribution of the particle flux of the sputtered Ti atoms was determined by the collection method, i.e. by growing Ti films and measuring their thickness. The formal description of the particle flux can be realized by dividing it into an isotropic and an anisotropic part. The experimental data show that increasing the ion energy or decreasing the ion incidence angle lead to an increase of the isotropic part, which is in good agreement with basic sputtering theory. The energy distribution of the secondary ions was measured using an energy-selective mass spectrometer. The energy distribution of the sputtered target ions shows a maximum at an energy between 10 eV and 20 eV followed by a decay proportional to E-n, which is in principle in accordance with Thompson's theory, followed by a high energetic tail. When the sum of incidence angle and emission angle is increased, the high-energetic tail expands to higher energies and an additional peak due to direct sputtering events may occur. In the case of backscattered primary Ar ions, a maximum at an energy between 5 eV and 10 eV appears and, depending on the scattering geometry, an additional broad peak at a higher energy due to direct scattering events is observed. The center energy of the additional structure shifts systematically to higher energies with decreasing scattering angle or increasing ion energy. The experimental results are compared to calculations based on simple elastic two-particle-interaction theory and to simulations done with the Monte Carlo code SDTrimSP. Both confirm in principle the experimental findings.

  6. Design of a plasma discharge circuit for particle wakefield acceleration

    CERN Document Server

    Anania, M P; Cianchi, A; Di Giovenale, D; Ferrario, M; Flora, F; Gallerano, G P; Ghigo, A; Marocchino, A; Massimo, F; Mostacci, A; Mezi, L; Musumeci, P; Serio, M; 10.1016/j.nima.2013.10.053

    2014-01-01

    Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10-100 GV m^-1), enabling acceleration of electrons to GeV energy in few centimetres. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators; radiofrequency-based accelerators, in fact, are limited in the accelerating field (10-100 MV m^-1) requiring therefore kilometric distances to reach the GeV energies, but can provide very bright electron bunches. Combining high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of shor...

  7. Experiments on TFTR supershot plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Strachan, J.D.; Bell, M.; Janos, A.; Kaye, S.; Kilpatrick, S.; Manos, D.; Mansfield, D.; Mueller, D.; Owens, K; Timberlake, J. [Princeton Univ., NJ (United States). Plasma Physics Lab.; Pitcher, C.S. [Canadian Fusion Fuels Technology Project, Toronto, ON (Canada); Snipes, J. [Massachusetts Inst. of Tech., Cambridge, MA (United States). Plasma Fusion Center

    1992-05-01

    Improvements to the TFTR limiter have extended the threshold for carbon blooms (an uncontrolled massive influx of carbon) to greater than 32 MW for 1 sec so that blooms seldom occur in present TFTR Supershot experiments. As a result of the progression from strong blooms to modest blooms to no blooms, improvements in confinement could be correlated with the occurrence of a carbon bloom in the plasma which immediately preceded the supershot. It is speculated that the carbon influx during a carbon bloom results in a limiter surface which has a slightly reduced self=sputtering yield for subsequent discharge. The influence on the supershot plasma seems similar to phenomena obtained by conditioning with lithium pellets.

  8. Kinetic and Potential Sputtering of Lunar Regolith: The Contribution of the Heavy Highly Charged (Minority) Solar Wind Ions

    Science.gov (United States)

    Meyer, F. W.; Barghouty, A. F.

    2012-01-01

    Solar wind sputtering of the lunar surface helps determine the composition of the lunar exosphere and contributes to surface weathering. To date, only the effects of the two dominant solar wind constituents, H+ and He+, have been considered. The heavier, less abundant solar wind constituents have much larger sputtering yields because they have greater mass (kinetic sputtering) and they are highly charged (potential sputtering) Their contribution to total sputtering can therefore be orders of magnitude larger than their relative abundances would suggest

  9. Particle Transport along Magnetic Null Lines as Sputter or Antihydrogen Source

    Science.gov (United States)

    Lane, R. A.; Ordonez, C. A.

    Particle transport along null magnetic lines is investigated using classical trajectory Monte Carlo simulations and described as a traveling wave and through diffusion equations. A magnetic null line is defined as a one-dimensional region where the magnetic field magnitude is zero. This region may take any shape in three-dimensional space. The field used in the simulations is generated by two infinite wires of negligible thickness carrying identical current and separated by a small distance. Thus, an infinite magnetic null line exists directly between the wires. The particle trajectories are simulated by solving the equations of motion for each simulated particle of a mono- energetic set. Each is considered individually, with all trajectories starting from the same position along the null line. Each trajectory is simulated until it reaches a specified distance from the initial point or a maximum time elapses. The simulation is repeated using a full set for multiple endpoints and maximum times for ten different amounts of current in the wires. Each current value is selected so that no particles can travel more than seven times the distance between the wires from the null line. The fraction of particles that reach the endpoint in a given time is calculated and used to describe particle transport parallel to the null line. The results are given in normalized, dimensionless units and their possible applications as an antihydrogen source and use in ultra-high purity sputter are discussed. The results are used to find the conditions necessary to obtain a steady and uniform particle flux suitable for ultra-high purity sputter, assuming that plasma is generated near the null line.

  10. Antimicrobial brass coatings prepared on poly(ethylene terephthalate) textile by high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Ying-Hung, E-mail: tieamo2002@gmail.com; Wu, Guo-Wei; He, Ju-Liang

    2015-03-01

    The goal of this work is to prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on poly(ethylene terephthalate) (PET) fabric by high-power impulse magnetron sputtering (HIPIMS), which is known to provide high-density plasma, so as to generate a strongly adherent film at a reduced substrate temperature. The results reveal that the brass film grows in a layer-plus-island mode. Independent of their deposition time, the obtained films retain a Cu/Zn elemental composition ratio of 1.86 and exhibit primarily an α copper phase structure. Oxygen plasma pre-treatment for 1 min before coating can significantly increase film adhesion such that the brass-coated fabric of Grade 5 or Grade 4–5 can ultimately be obtained under dry and wet rubbing tests, respectively. However, a deposition time of 1 min suffices to provide effective antimicrobial properties for both Staphylococcus aureus and Escherichia coli. As a whole, the feasibility of using such advanced HIPIMS coating technique to develop durable antimicrobial textile was demonstrated. - Highlights: • Prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on PET fabric by HIPIMS • Brass-coated fabric with excellent durability, even undergone rubbing and washing tests • Brass-coated fabric provides effective antimicrobial properties for E. coli and S. aureus. • After brass coating, PET fabric still retained its mechanical property.

  11. Fabrication of AZO TCO Films by RF-sputtering and Their Physical Properties

    Directory of Open Access Journals (Sweden)

    Jang T.S.

    2016-01-01

    Full Text Available We report on the fabrication of Al-doped ZnO (AZO transparent-conductive oxide (TCO films on glass substrates by RF-sputtering, their physical properties, and the effect of thermal annealing on the AZO TCO films. The AZO films on glass substrates have a preferred orientation of the c-axis, irrespective of deposition conditions, which means that the AZO films have textured structures along the c-axis. The film thickness and surface roughness in the AZO films are proportional to plasma power and deposition time, while they are inverse-proportional to working gas ratio and working pressure. The AZO films have the optical transmittance over 80 % in the wavelength range of 400 – 1000 nm, irrespective of deposition conditions. The plasma power and the deposition time relatively give a large influence on the optical transmittance, compared to the working gas ratio and the working pressure. The AZO films deposited at room temperature have poor electrical properties, while the thermal annealing under Ar ambient significantly improves the electrical conductivity of the AZO films: an as-deposited sample has an electrical resistivity of 87 Wcm and an electron concentration of 1.3´1017 cm−3, while the annealed sample has an electrical resistivity of 3.7´10-2 Wcm and an electron concentration of 1.2´1020 cm−3.

  12. Antimicrobial brass coatings prepared on poly(ethylene terephthalate) textile by high power impulse magnetron sputtering.

    Science.gov (United States)

    Chen, Ying-Hung; Wu, Guo-Wei; He, Ju-Liang

    2015-03-01

    The goal of this work is to prepare antimicrobial, corrosion-resistant and low-cost Cu65Zn35 brass film on poly(ethylene terephthalate) (PET) fabric by high-power impulse magnetron sputtering (HIPIMS), which is known to provide high-density plasma, so as to generate a strongly adherent film at a reduced substrate temperature. The results reveal that the brass film grows in a layer-plus-island mode. Independent of their deposition time, the obtained films retain a Cu/Zn elemental composition ratio of 1.86 and exhibit primarily an α copper phase structure. Oxygen plasma pre-treatment for 1min before coating can significantly increase film adhesion such that the brass-coated fabric of Grade 5 or Grade 4-5 can ultimately be obtained under dry and wet rubbing tests, respectively. However, a deposition time of 1min suffices to provide effective antimicrobial properties for both Staphylococcus aureus and Escherichia coli. As a whole, the feasibility of using such advanced HIPIMS coating technique to develop durable antimicrobial textile was demonstrated.

  13. Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Bogota Colombia (Colombia); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico)], E-mail: muhl@servidor.unam.mx

    2008-10-01

    Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN{sub x} films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N{sub 2} ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV{sub 0.025}. While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV{sub 0.025}. The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics.

  14. SMEX03 SSM/I Brightness Temperature Data, Brazil

    Data.gov (United States)

    National Aeronautics and Space Administration — This data set provides brightness temperature data acquired during the Soil Moisture Experiment 2003 (SMEX03) by the Special Sensor Microwave/Imager (SSM/I). The...

  15. Visible Color and Photometry of Bright Materials on Vesta

    Science.gov (United States)

    Schroder, S. E.; Li, J. Y.; Mittlefehldt, D. W.; Pieters, C. M.; De Sanctis, M. C.; Hiesinger, H.; Blewett, D. T.; Russell, C. T.; Raymond, C. A.; Keller, H. U.

    2012-01-01

    The Dawn Framing Camera (FC) collected images of the surface of Vesta at a pixel scale of 70 m in the High Altitude Mapping Orbit (HAMO) phase through its clear and seven color filters spanning from 430 nm to 980 nm. The surface of Vesta displays a large diversity in its brightness and colors, evidently related to the diverse geology [1] and mineralogy [2]. Here we report a detailed investigation of the visible colors and photometric properties of the apparently bright materials on Vesta in order to study their origin. The global distribution and the spectroscopy of bright materials are discussed in companion papers [3, 4], and the synthesis results about the origin of Vestan bright materials are reported in [5].

  16. Bright Prospect for the Polyester Industrial Filament Sector

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    @@ Some large companies from Americaand Europe have constructed plantsin China or established long-termstable cooperation relationship withChinese enterprises. A bright devel-opment prospect has therefore beenbrought to the polyester industrial fila-ment sector in China.

  17. An observational correlation between stellar brightness variations and surface gravity

    CERN Document Server

    Bastien, Fabienne A; Basri, Gibor; Pepper, Joshua

    2013-01-01

    Surface gravity is one of a star's basic properties, but it is difficult to measure accurately, with typical uncertainties of 25-50 per cent if measured spectroscopically and 90-150 per cent photometrically. Asteroseismology measures gravity with an uncertainty of about two per cent but is restricted to relatively small samples of bright stars, most of which are giants. The availability of high-precision measurements of brightness variations for >150,000 stars provides an opportunity to investigate whether the variations can be used to determine surface gravities. The Fourier power of granulation on a star's surface correlates physically with surface gravity; if brightness variations on timescales of hours arise from granulation, then such variations should correlate with surface gravity. Here we report an analysis of archival data that reveals an observational correlation between surface gravity and the root-mean-square brightness variations on timescales of less than eight hours for stars with temperatures ...

  18. SMEX03 SSM/I Brightness Temperature Data, Georgia

    Data.gov (United States)

    National Aeronautics and Space Administration — This data set provides brightness temperature data acquired during the Soil Moisture Experiment 2003 (SMEX03) by the Special Sensor Microwave/Imager (SSM/I). The...

  19. Operational Bright-Band Snow Level Detection Using Doppler Radar

    Data.gov (United States)

    National Oceanic and Atmospheric Administration, Department of Commerce — A method to detect the bright-band snow level from radar reflectivity and Doppler vertical velocity data collection with an atmospheric profiling Doppler radar. The...

  20. Ultra High Brightness/Low Cost Fiber Coupled Packaging Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The focus of the proposed effort is maximizing the brightness of fiber coupled laser diode pump sources at a minimum cost. The specific innovation proposed is to...

  1. Supercontinuum generation with bright and dark solitons in optical fibers

    CERN Document Server

    Milián, Carles; Kudlinski, Alexandre; Skryabin, Dmitry V

    2016-01-01

    We study numerically and experimentally supercontinuum generation in optical fibers with dark and bright solitons simultaneously contributing into the spectral broadening and dispersive wave generation. We report a novel type of weak trapped radiation arising due to interaction of bright solitons with the dark soliton background. This radiation expresses itself as two pulses with the continuously shifting spectra constituting the short and long wavelength limits of the continuum. Our theoretical and experimental results are in good agreement.

  2. Sputtering process and apparatus for coating powders

    Science.gov (United States)

    Makowiecki, Daniel M.; Kerns, John A.; Alford, Craig S.; McKernan, Mark A.

    2002-01-01

    A process and apparatus for coating small particles and fibers. The process involves agitation by vibrating or tumbling the particles or fibers to promote coating uniformly, removing adsorbed gases and static charges from the particles or fibers by an initial plasma cleaning, and coating the particles or fibers with one or more coatings, a first coating being an adhesion coating, and with subsequent coatings being deposited in-situ to prevent contamination at layer interfaces. The first coating is of an adhesion forming element (i.e. W, Zr, Re, Cr, Ti) of a 100-10,000 .ANG. thickness and the second coating or final coating of a multiple (0.1-10 microns) being Cu or Ag, for example for brazing processes, or other desired materials that defines the new surface related properties of the particles. An essential feature of the coating process is the capability to deposit in-situ without interruption to prevent the formation of a contaminated interface that could adversely affect the coating adhesion. The process may include screening of the material to be coated and either continuous or intermittent vibration to prevent agglomeration of the material to be coated.

  3. Global View of the Bright Material on Vesta

    Science.gov (United States)

    Zambon, F.; DeSanctis, C.; Schroeder, S.; Tosi, F.; Li, J.-Y.; Longobardo, A.; Ammannito, E.; Blewett, D. T.; Palomba, E.; Capaccioni, F.; Frigeri, A.; Capria, M. T.; Fonte, S.; Mittlefehldt, D. W.; Nathues, A.; Pieters, C.; Russell, C. T.; Raymond, C. A.

    2014-01-01

    At 525 km in mean diameter, Vesta is the second-most massive and one of the brightest asteroids of the main-belt. Here we give a global view of the bright material (BM) units on Vesta. We classified the BMs according to the normal visual albedo. The global albedo map of Vesta allows to be divided the surface into three principal types of terrains: bright regions, dark regions and intermediate regions. The distribution of bright regions is not uniform. The mid-southern latitudes contain the most bright areas, while the northern hemisphere is poor in bright regions. The analysis of the spectral parameters and the normal visual albedo show a dependence between albedo and the strength (depth) of ferrous iron absorption bands, strong bands correspond with high albedo units. Vesta's average albedo is 0.38, but there are bright material whose albedo can exceed 0.50. Only the E-Type asteroids have albedos comparable to those of the BMs on Vesta. The Dawn mission observed a large fraction of Vesta's surface at high spatial resolution, allowing a detailed study of the morphology and mineralogy of it. In particular, reflectance spectra provided by the Visible and InfraRed spectrometer (VIR), confirmed that Vesta's mineralogy is dominated by pyroxenes. All Vesta spectra show two strong absorption bands at approx 0.9 and 1.9 micron, typical of the pyroxenes and associated with the howardite, eucrite and diogenite (HED) meteorites.

  4. Image Contrast Enhancement for Brightness Preservation Based on Dynamic Stretching

    Directory of Open Access Journals (Sweden)

    M.A. Rahman

    2015-08-01

    Full Text Available Histogram equalization is an efficient process often employed in consumer electronic systems for image contrast enhancement. In addition to an increase in contrast, it is also required to preserve the mean brightness of an image in order to convey the true scene information to the viewer. A conventional approach is to separate the image into sub-images and then process independently by histogram equalization towards a modified profile. However, due to the variations in image contents, the histogram separation threshold greatly influences the level of shift in mean brightness with respect to the uniform histogram in the equalization process. Therefore, the choice of a proper threshold, to separate the input image into sub-images, is very critical in order to preserve the mean brightness of the output image. In this research work, a dynamic range stretching approach is adopted to reduce the shift in output image mean brightness. Moreover, the computationally efficient golden section search algorithm is applied to obtain a proper separation into sub-images to preserve the mean brightness. Experiments were carried out on a large number of color images of natural scenes. Results, as compared to current available approaches, showed that the proposed method performed satisfactorily in terms of mean brightness preservation and enhancement in image contrast.

  5. Evolution of Bright Screening-photovoltaic Spatial Optical Solitons

    Institute of Scientific and Technical Information of China (English)

    LIU Jinsong

    2001-01-01

    A numerical analysis of the dynamical evolution of bright screening-photovoltaic (SP) spatial solitons in biased photovoltaic-photorefractive materials in the case of neglecting the material loss and the diffusion is presented. When an incident optical beam is a bright SP soliton, the beam propagates along a linear path with its shape kept unchanged. When the incident optical beam is slightly different from a bright SP soliton, the beam reshapes itself and tries to evolve into a bright SP soliton after a short distance. However, when the incident optical beam is significantly different from a SP bright soliton, the beam cannot evolve into a stable bright SP soliton, and tends to experience periodic compression and expansion. For a low-intensity input beam, the wave experiences a periodic process of compression first and then expansion during the initial part of the cycle. For a high-intensity input beam, however, the wave will initially diffract and then experiences compression during the cycle.

  6. Plasma turbulence

    Energy Technology Data Exchange (ETDEWEB)

    Horton, W. [Univ. of Texas, Austin, TX (United States). Inst. for Fusion Studies; Hu, G. [Globalstar LP, San Jose, CA (United States)

    1998-07-01

    The origin of plasma turbulence from currents and spatial gradients in plasmas is described and shown to lead to the dominant transport mechanism in many plasma regimes. A wide variety of turbulent transport mechanism exists in plasmas. In this survey the authors summarize some of the universally observed plasma transport rates.

  7. Molybdenum sputtering film characterization for high gradient accelerating structures

    CERN Document Server

    Bini, S; Marcelli, A; Sarti, S; Dolgashev, V A; Tantawi, S; Yeremian, A D; Higashi, Y; Grimaldi, M G; Romano, L; Ruffino, F; Parodi, R; Cibin, G; Marrelli, C; Migliorati, M; Caliendo, C

    2012-01-01

    Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress. In this contribution we describe chemical composition, deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering. The deposited films are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value. Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering, XANES and photoemission spectroscopy. We will also present a three cells standing wave section coated by a molybdenum layer $\\sim$ 500 nm thick designed to improve the performance of X-Band accelerating systems.

  8. PREFERENTIAL SPUTTERING OF Cu76Ni15Sn9

    Institute of Scientific and Technical Information of China (English)

    王震遐; 王传珊; 等

    1995-01-01

    Using collection film technique combined with Auger electron spectroscopy is analysis,the preferential sputtering of the ternary alloy Cu76Ni15Sn9 bombarded with 27keV Ar+ at normal incidence is studied.After bombardment,the target surface is examined with SEM,and the surface composition of different topographical feature areas is measured with electron probe micro-analyser(EPMA),The experiment results show that Cu atoms are preferentially ejected compared with Ni atoms,and Sn atoms come third within the ejection angle range from 0°to 60°.The results are discussed from the viewpoint of sputtering from a very rough surface.

  9. A COMPLEX—TYPE FOCUSSED MAGNTRON FOR SPUTTERING

    Institute of Scientific and Technical Information of China (English)

    郑思孝

    1994-01-01

    The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described.The magnetron tunnel of the magentron source was constructed by a planar unbalanced magnetic annulus,which comes from the extended co-axial magnetron principle and inside cylindrical magnet tunnel.The use efficinecy of inside circular cone sputtering target area is high up to 62%.The inside-inversion cone sputtering target has a long life and results in a higher deposition rate 35nm/min for Ti at a 2.5Pa Ar pressure.A better focussing direction of ejecting atom beam has been achieved,and the are power input is 300W for Ti target.

  10. Nb Sputtered Quarter Wave Resonators for the HIE-ISOLDE

    CERN Document Server

    Venturini Delsolaro, W; Delaup, B; D'Elia, A; Jecklin, N M; Kadi, Y; Keppel, G; Lespinasse, D; Maesen, P; Mondino, I; Palmieri, V; Stark, S; Sublet, A R M; Therasse, M

    2013-01-01

    The HIE-ISOLDE superconducting linac will be based on quarter wave resonators (QWRs), made by niobium sputtering on copper. The operating frequency at 4.5 K is 101.28 MHz and the required performance for the high beta cavity is 6 MV/m accelerating field for 10 W maximum power dissipation. These challenging specifications were recently met at CERN at the end of a vigorous development program. The paper reports on the progress of the cavity RF performance with the evolution of the sputtering process; it equally illustrates the parallel R&D which is on-going at CERN and at INFN in the quest for even higher performances.

  11. Molybdenum sputtering film characterization for high gradient accelerating structures

    Institute of Scientific and Technical Information of China (English)

    S.Bini; B.Spataro; A.Marcelli; S.Sarti; V.A.Dolgashev; S.Tantawi; A.D.Yeremian

    2013-01-01

    Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders.To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress.In this contribution we describe chemical composition,deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering.The deposited films are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value.Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering,XANES and photoemission spectroscopy.We will also consider multiple cells standing wave section coated by a molybdenum layer designed to improve the performance of X-Band accelerating systems.

  12. Physicochemical model for reactive sputtering of hot target

    Science.gov (United States)

    Shapovalov, Viktor I.; Karzin, Vitaliy V.; Bondarenko, Anastasia S.

    2017-02-01

    A physicochemical model for reactive magnetron sputtering of a metal target is described in this paper. The target temperature in the model is defined as a function of the ion current density. Synthesis of the coating occurs due to the surface chemical reaction. The law of mass action, the Langmuir isotherm and the Arrhenius equation for non-isothermal conditions were used for mathematical description of the reaction. The model takes into consideration thermal electron emission and evaporation of the target surface. The system of eight algebraic equations, describing the model, was solved for the tantalum target sputtered in the oxygen environment. It was established that the hysteresis effect disappears with the increase of the ion current density.

  13. Molecular dynamic simulations of the sputtering of multilayer organic systems

    CERN Document Server

    Postawa, Z; Piaskowy, J; Krantzman, K; Winograd, N; Garrison, B J

    2003-01-01

    Sputtering of organic overlayers has been modeled using molecular dynamics computer simulations. The investigated systems are composed of benzene molecules condensed into one, two and three layers on an Ag left brace 1 1 1 right brace surface. The formed organic overlayers were bombarded with 4 keV Ar projectiles at normal incidence. The development of the collision cascade in the organic overlayer was investigated. The sputtering yield, mass, internal and kinetic energy distributions of ejected particles have been analyzed as a function of the thickness of the organic layer. The results show that all emission characteristics are sensitive to the variation of layer thickness. Although most of the ejected intact benzene molecules originate from the topmost layer, the emission of particles located initially in second and third layers is significant. The analysis indicates that the metallic substrate plays a dominant role in the ejection of intact organic molecules.

  14. Deposition and tribological behaviour of sputtered carbon hard coatings

    Energy Technology Data Exchange (ETDEWEB)

    Yang, S.; Camino, D.; Jones, A.H.S.; Teer, D.G. [Teer Coatings Ltd., Hartlebury (United Kingdom)

    2000-02-21

    The exceptional tribological properties of low deposition temperature sputtered carbon coatings (Graphit-iC coatings) have been recently reported. This paper describes the latest development of these coatings and particularly how, by an optimisation of the deposition parameters, it has been possible to obtain relative soft to very hard coatings with extremely low specific wear rates. The coatings have been deposited in a closed field unbalanced magnetron sputter ion plating (CFUBMSIP) installation. By applying the appropriate conditions of deposition, carbon coatings with hardness from 1500 to 4000 HV can be routinely deposited. Preliminary analytical results are presented in order to characterise such hard coatings: high-resolution transmission electron microscopy, scanning electron microscopy and X-ray diffraction analysis are some of the different techniques used for this work. Finally, a number of the applications are reported with tribological test results. (orig.)

  15. Method and apparatus for improved high power impulse magnetron sputtering

    Science.gov (United States)

    Anders, Andre

    2013-11-05

    A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

  16. In vitro flow measurements in ion sputtered hydrocephalus shunts

    Science.gov (United States)

    Cho, Y. I.; Back, L. H.

    1989-01-01

    This paper describes an experimental procedure for accurate measurements of the pressure-drop/flow rate relationship in hydrocephalus shunts. Using a fish-hook arrangement, small flow rates in a perforated ion-sputtered Teflon microtubule were measured in vitro in a pressured system and were correlated with pressure in the system. Results indicate that appropriate drainage rates could be obtained in the physiological range for hydrocephalus shunts.

  17. Precipitate-Accommodated Plasma Nitriding for Aluminum Alloys

    Institute of Scientific and Technical Information of China (English)

    Patama Visittipitukul; Tatsuhiko Aizawa; Hideyuki Kuwahara

    2004-01-01

    Reliable surface treatment has been explored to improve the strength and wear resistance of aluminum alloy parts in automotives. Long duration time as well as long pre-sputtering time are required for plasma nitriding of aluminum or its alloys only with the thickness of a few micrometers. New plasma inner nitriding is proposed to realize the fast-rate nitriding of aluminum alloys. Al-6Cu alloy is employed as a targeting material in order to demonstrate the effectiveness of this plasma nitriding. Mechanism of fast-rate nitriding process is discussed with consideration of the role of Al2Cu precipitates.

  18. Results of Satellite Brightness Modeling Using Kringing Optimized Interpolation

    Science.gov (United States)

    Weeden, C.; Hejduk, M.

    At the 2005 AMOS conference, Kriging Optimized Interpolation (KOI) was presented as a tool to model satellite brightness as a function of phase angle and solar declination angle (J.M Okada and M.D. Hejduk). Since November 2005, this method has been used to support the tasking algorithm for all optical sensors in the Space Surveillance Network (SSN). The satellite brightness maps generated by the KOI program are compared to each sensor's ability to detect an object as a function of the brightness of the background sky and angular rate of the object. This will determine if the sensor can technically detect an object based on an explicit calculation of the object's probability of detection. In addition, recent upgrades at Ground-Based Electro Optical Deep Space Surveillance Sites (GEODSS) sites have increased the amount and quality of brightness data collected and therefore available for analysis. This in turn has provided enough data to study the modeling process in more detail in order to obtain the most accurate brightness prediction of satellites. Analysis of two years of brightness data gathered from optical sensors and modeled via KOI solutions are outlined in this paper. By comparison, geo-stationary objects (GEO) were tracked less than non-GEO objects but had higher density tracking in phase angle due to artifices of scheduling. A statistically-significant fit to a deterministic model was possible less than half the time in both GEO and non-GEO tracks, showing that a stochastic model must often be used alone to produce brightness results, but such results are nonetheless serviceable. Within the Kriging solution, the exponential variogram model was the most frequently employed in both GEO and non-GEO tracks, indicating that monotonic brightness variation with both phase and solar declination angle is common and testifying to the suitability to the application of regionalized variable theory to this particular problem. Finally, the average nugget value, or

  19. Tribological properties of sputtered tungsten and tungsten nitride thin films

    Institute of Scientific and Technical Information of China (English)

    Wong; K.M.; ShenY.G.; Wong; P.L.

    2001-01-01

    The surface roughness, hardness and tribological properties of tungsten (W) and tung-sten nitride (WNx) thin films prepared by dc magnetron sputtering and reactive magnetron sputter-ing in Ar-N2 gas mixtures have been studied using atomic force microscopy (AFM), nanoindenta-tion measurements and ball-on-disc wear testing. A pronounced surface roughness was observedonly for films under compressive strains. The surface was flat under tension but rough under com-pression. Similar hardness with value about 20 GPa were observed in the W and WNx (x=0.3)films. This is thought to be due to the fact the grains are restricted to a very small size in the coat-ings. The higher coefficients of friction (0.4 for W and 0.9 for WN0.3) suggest that WN0.3 is not theoptimum phase. Finally, discussions are made with tribological test results.

  20. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  1. Sputter deposited Terfenol-D thin films for multiferroic applications

    Science.gov (United States)

    Mohanchandra, K. P.; Prikhodko, S. V.; Wetzlar, K. P.; Sun, W. Y.; Nordeen, P.; Carman, G. P.

    2015-09-01

    In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm) with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011) cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10-6.

  2. Stress dependent oxidation of sputtered niobium and effects on superconductivity

    Science.gov (United States)

    David Henry, M.; Wolfley, Steve; Monson, Todd; Clark, Blythe G.; Shaner, Eric; Jarecki, Robert

    2014-02-01

    We report on the suppression of room temperature oxidation of DC sputtered niobium films and the effects upon the superconductive transition temperature, Tc. Niobium was sputter-deposited on silicon dioxide coated 150 mm wafers and permitted to oxidize at room temperature and pressure for up to two years. Resistivity and stress measurements indicate that tensile films greater than 400 MPa resist bulk oxidation with measurements using transmission electron microscope, electron dispersive X-ray spectroscopy, x-ray photoelectric spectroscopy, and secondary ion mass spectrometry confirming this result. Although a surface oxide, Nb2O5, consumed the top 6-10 nm, we measure less than 1 at. % oxygen and nitrogen in the bulk of the films after the oxidation period. Tc measurements using a SQUID magnetometer indicate that the tensile films maintained a Tc approaching the dirty superconductive limit of 8.4 K after two years of oxidation while maintaining room temperature sheet resistance. This work demonstrates that control over niobium film stress during deposition can prevent bulk oxidation by limiting the vertical grain boundaries ability to oxidize, prolonging the superconductive properties of sputtered niobium when exposed to atmosphere.

  3. Functional nanostructured titanium nitride films obtained by sputtering magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, O. [Instituto de Ciencia de Materiales de Madrid (CSIC), Sor Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain)]. E-mail: olgas@icmm.csic.es; Hernandez-Velez, M. [Instituto de Ciencia de Materiales de Madrid (CSIC), or Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain); Dept. Fisica Aplicada C-XII, Universidad Autonoma, Cantoblanco 28049 Madrid (Spain); Navas, D. [Instituto de Ciencia de Materiales de Madrid (CSIC), Sor Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain); Auger, M.A. [Centro Nacional de Investigaciones Metalurgicas (CENIM-CSIC), Avda. Gregorio, del Amo 8, 28040 Madrid (Spain); Baldonedo, J.L. [Centro de Microscopia Electronica y Citometria de la Universidad Complutense de, Madrid (Spain); Sanz, R. [Instituto de Ciencia de Materiales de Madrid (CSIC), Sor Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain); Pirota, K.R. [Instituto de Ciencia de Materiales de Madrid (CSIC), or Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain); Vazquez, M. [Instituto de Ciencia de Materiales de Madrid (CSIC), Sor Juana Ines de la Cruz no3, Cantoblanco, 28049 Madrid (Spain)

    2006-01-20

    Development of new methods in the formation of hollow structures, in particular, nanotubes and nanocages are currently generating a great interest as a consequence of the growing relevance of these nanostructures on many technological fields, ranging from optoelectronics to biotechnology. In this work, we report the formation of titanium nitride (TiN) nanotubes and nanohills via reactive sputtering magnetron processes. Anodic Alumina Membranes (AAM) were used as template substrates to grow the TiN nanostructures. The AAM were obtained through electrochemical anodization processes by using oxalic acid solutions as electrolytes. The nanotubes were produced at temperatures below 100 deg. C, and using a pure titanium (99.995%) sputtering target and nitrogen as reactive gas. The obtained TiN thin films showed surface morphologies adjusted to pore diameter and interpore distance of the substrates, as well as ordered arrays of nanotubes or nanohills depending on the sputtering and template conditions. High Resolution Scanning Electron Microscopy (HRSEM) was used to elucidate both the surface order and morphology of the different grown nanostructures. The crystalline structure of the samples was examined using X-ray Diffraction (XRD) patterns and their qualitative chemical composition by using X-ray Energy Dispersive Spectroscopy (XEDS) in a scanning electron microscopy.

  4. Sputtering as a Technique for Applying Tribological Coatings

    Science.gov (United States)

    Ramalingam, S.

    1984-01-01

    Friction and wear-induced mechanical failures may be controlled to extend the life of tribological components through the interposition of selected solid materials between contacting surfaces. Thin solid films of soft and hard materials are appropriate to lower friction and enhance the wear resistance of precision tribo-elements. Tribological characteristics of thin hard coats deposited on a variety of ferrous and non-ferrous substrates were tested. The thin hard coats used were titanium nitride films deposited by reactive magnetron sputtering of metallic titanium. High contact stress, low speed tests showed wear rate reductions of one or more magnitude, even with films a few micrometers in thickness. Low contact stress, high speed tests carried out under rather severe test conditions showed that thin films of TiN afforded significant friction reduction and wear protection. Thin hard coats were shown to improve the friction and wear performance of rolling contacts. Satisfactory film-to-substrate adhesion strengths can be obtained with reactive magnetron sputtering. X-ray diffraction and microhardness tests were employed to assess the effectiveness of the sputtering technique.

  5. An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge

    Science.gov (United States)

    Gudmundsson, J. T.; Lundin, D.; Brenning, N.; Raadu, M. A.; Huo, Chunqing; Minea, T. M.

    2016-12-01

    A new reactive ionization region model (R-IRM) is developed to describe the reactive Ar/O2 high power impulse magnetron sputtering (HiPIMS) discharge with a titanium target. It is then applied to study the temporal behavior of the discharge plasma parameters such as electron density, the neutral and ion composition, the ionization fraction of the sputtered vapor, the oxygen dissociation fraction, and the composition of the discharge current. We study and compare the discharge properties when the discharge is operated in the two well established operating modes, the metal mode and the poisoned mode. Experimentally, it is found that in the metal mode the discharge current waveform displays a typical non-reactive evolution, while in the poisoned mode the discharge current waveform becomes distinctly triangular and the current increases significantly. Using the R-IRM we explore the current increase and find that when the discharge is operated in the metal mode Ar+ and Ti+ -ions contribute most significantly (roughly equal amounts) to the discharge current while in the poisoned mode the Ar+ -ions contribute most significantly to the discharge current and the contribution of O+ -ions, Ti+ -ions, and secondary electron emission is much smaller. Furthermore, we find that recycling of atoms coming from the target, that are subsequently ionized, is required for the current generation in both modes of operation. From the R-IRM results it is found that in the metal mode self-sputter recycling dominates and in the poisoned mode working gas recycling dominates. We also show that working gas recycling can lead to very high discharge currents but never to a runaway. It is concluded that the dominating type of recycling determines the discharge current waveform.

  6. Zeeman Spectroscopy of Tokamak Edge Plasmas

    Science.gov (United States)

    Hey, J. D.; Chu, C. C.; Mertens, Ph.

    2002-12-01

    Zeeman spectroscopy is a valuable tool both for diagnostic purposes, and for more fundamental studies of atomic and molecular processes in the boundary region of magnetically confined fusion plasmas (B ≃ 1 to 10 T). The method works well when the Zeeman (Paschen-Back) effect plays an important, or dominant, rôle in relation to other broadening mechanisms (Doppler, Stark, resonant excitation transfer) in determining the spectral line shape. For impurity species identification and temperature determination, Zeeman spectroscopy has advantages over charge-exchange recombination spectroscopy from highly excited radiator states, since spectral features practically unique to the species under investigation are analysed. It also provides useful information on probable mechanisms of line production (e.g. sputtering mechanisms, electron impact-induced dissociative excitation from molecules in the edge plasma), and on the temperature evolution of lower charge states in the process of convection inwards or diffusion outwards from the hotter plasma interior. Where different physical processes are responsible for different sections of the line profile — especially in the case of hydrogen isotopes — Zeeman spectroscopy can provide a set of characteristic temperatures for each section. The method is introduced in both passive and active spectroscopy, and general principles of the Zeeman effect are discussed with special reference to régimes of interest for the tokamak. Relevant physical processes (sputtering mechanisms, electron impact-induced dissociative excitation from molecules in the edge plasma, and ion-atom collisional heating mechanisms) are illustrated by sample spectra.

  7. Luminosity Limitations in Linear Colliders Based on Plasma Acceleration

    CERN Document Server

    Lebedev, Valeri; Nagaitsev, Sergei

    2016-01-01

    Particle acceleration in plasma creates a possibility of exceptionally high accelerating gradients and appears as a very attractive option for future linear electron-positron and/or photon-photon colliders. These high accelerating gradients were already demonstrated in a number of experiments. However, a linear collider requires exceptionally high beam brightness which still needs to be demonstrated. In this article we discuss major phenomena which limit the beam brightness of accelerated beam and, consequently, the collider luminosity.

  8. Molecular dynamics study on low-energy sputtering of carbon material by Xe ion bombardment

    Science.gov (United States)

    Muramoto, T.; Hyakutake, T.

    2013-05-01

    The low-energy sputtering of carbon material under Xe ion bombardment is studied through the molecular dynamics (MD) simulation. For the normal incidence of Xe, the MD result of sputtering yield almost agrees with the experimental result by Williams et al. (AIAA-2004-3788). However, the experimental result shows a less incident angle dependence than the MD result because the experiment performed on a rough surface. It is found that the sputtered particles have memory of the projectile because the sputtered particles by the low-energy projectile undergo only a few collisions before the ejection. Low density of an amorphous carbon surface brings the decrease of the sputtering yield and the increase of high-energy sputtered atoms.

  9. Sputtering Preparation and Magneto-optical Properties of GdTbFeCo Thin Films

    Institute of Scientific and Technical Information of China (English)

    HUANG Zhixin; YU Weijun

    2012-01-01

    Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target.The influences of sputtering parameters on the magnetooptical properties GdTbFeCo thin film were investigated by the variable control method.And the influence mechanism was analyzed in detail.After the sputtering parameters were optimized,it was found that when the distance between target and substrate was 72 mm,the thin film thickness was 120 nm,and the sputtering power,sputtering pressure and sputtering time was 75 W,0.5 Pa and 613 s,respectively,the coercivity with perpendicular anisotropy could be as high as 6735 Oe,and the squareness ratio of the hysteresis loop was almost equal to 1.

  10. Modeling Solar-Wind Heavy-Ions' Potential Sputtering of Lunar KREEP Surface

    Science.gov (United States)

    Barghouty, A. F.; Meyer, F. W.; Harris, R. P.; Adams, J. H., Jr.

    2012-01-01

    Recent laboratory data suggest that potential sputtering may be an important weathering mechanism that can affect the composition of both the lunar surface and its tenuous exosphere; its role and implications, however, remain unclear. Using a relatively simple kinetic model, we will demonstrate that solar-wind heavy ions induced sputtering of KREEP surfaces is critical in establishing the timescale of the overall solar-wind sputtering process of the lunar surface. We will also also show that potential sputtering leads to a more pronounced and significant differentiation between depleted and enriched surface elements. We briefly discuss the impacts of enhanced sputtering on the composition of the regolith and the exosphere, as well as of solar-wind sputtering as a source of hydrogen and water on the moon.

  11. Plasma harmonics

    CERN Document Server

    Ganeev, Rashid A

    2014-01-01

    Preface; Why plasma harmonics? A very brief introduction Early stage of plasma harmonic studies - hopes and frustrations New developments in plasma harmonics studies: first successes Improvements of plasma harmonics; Theoretical basics of plasma harmonics; Basics of HHG Harmonic generation in fullerenes using few-cycle pulsesVarious approaches for description of observed peculiarities of resonant enhancement of a single harmonic in laser plasmaTwo-colour pump resonance-induced enhancement of odd and even harmonics from a tin plasmaCalculations of single harmonic generation from Mn plasma;Low-o

  12. System for time-resolved laser absorption spectroscopy and its application to high-power impulse magnetron sputtering

    Science.gov (United States)

    Adámek, P.; Olejníček, J.; Hubička, Z.; Čada, M.; Kment, Š.; Kohout, M.; Do, H. T.

    2017-02-01

    This paper deals with the development and construction of an apparatus for time-resolved tunable diode laser absorption spectroscopy (LAS) for the diagnostics of pulsed plasma. A detailed description of the extension of a progressive method of laser absorption spectroscopy in continuous regime to a direct triggering method of the time-resolved laser absorption spectroscopy (TR-LAS) is presented. The main advantage of the developed method is its capability to measure the time evolution of the whole absorption profile with a preset time resolution, which can be less than 1 μs. Therefore, the presented method of repetitive sampling applied on LAS in plasma processes is capable of simultaneous measurement of the density and kinetic temperature of selected particles. Its appropriate applications are to periodical processes in technological plasma, namely pulsed plasma discharges. The developed method of TR-LAS was applied to measurements of the temporal evolution of density and kinetic temperature of argon metastable species during high-power impulse magnetron sputtering of titanium and titanium dioxide thin films.

  13. Antibacterial effects of silver-doped hydroxyapatite thin films sputter deposited on titanium

    Energy Technology Data Exchange (ETDEWEB)

    Trujillo, Nathan A. [Dept. of Mechanical Engineering, Colorado State University, Fort Collins, CO 80523-1374 (United States); School of Biomedical Engineering, Colorado State University, Fort Collins, CO 80523-1376 (United States); Oldinski, Rachael A. [College of Engineering and Mathematical Science, University of Vermont, Burlington, VT 05405 (United States); Dept. of Bioengineering, University of Washington, Seattle, WA 98195-5061 (United States); Ma, Hongyan; Bryers, James D. [Dept. of Bioengineering, University of Washington, Seattle, WA 98195-5061 (United States); Williams, John D. [Dept. of Mechanical Engineering, Colorado State University, Fort Collins, CO 80523-1374 (United States); Popat, Ketul C., E-mail: Ketul.Popat@colostate.edu [Dept. of Mechanical Engineering, Colorado State University, Fort Collins, CO 80523-1374 (United States); School of Biomedical Engineering, Colorado State University, Fort Collins, CO 80523-1376 (United States)

    2012-12-01

    Since many orthopedic implants fail as a result of loosening, wear, and inflammation caused by repeated loading on the joints, coatings such as hydroxyapatite (HAp) on titanium with a unique topography have been shown to improve the interface between the implant and the natural tissue. Another serious problem with long-term or ideally permanent implants is infection. It is important to prevent initial bacterial colonization as existing colonies have the potential to become encased in an extracellular matrix polymer (biofilm) that is resistant to antibacterial agents. In this study, plasma-based ion implantation was used to examine the effects of pre-etching on plain titanium. Topographical changes to the titanium samples were examined and compared via scanning electron microscopy. Hydroxyapatite and silver-doped hydroxyapatite thin films were then sputter deposited on titanium substrates etched at - 700 eV. For silver-doped films, two concentrations of silver ({approx} 0.5 wt.% and {approx} 1.5 wt.%) were used. Silver concentrations in the film were determined using energy dispersive X-ray spectroscopy. Hydroxyapatite film thicknesses were determined by measuring the surface profile using contact profilometry. Staphylococcus epidermidis and Pseudomonas aeruginosa adhesion studies were performed on plain titanium, titanium coated with hydroxyapatite, titanium coated with {approx} 0.5 wt.% silver-doped hydroxyapatite, and titanium coated with {approx} 1.5 wt.% silver-doped hydroxyapatite. Results indicate that less bacteria adhered to surfaces containing hydroxyapatite and silver; further, as the hydroxyapatite films delaminated, silver ions were released which killed bacteria in suspension. - Highlights: Black-Right-Pointing-Pointer We have developed a combination of plasma-based ion implantation and ion beam sputter deposition technique. Black-Right-Pointing-Pointer Silver-doped hydroxyapatite thin films on titanium were developed. Black-Right-Pointing-Pointer The

  14. Effect of sputtering power on structural and optical properties of radio frequency-sputtered In2S3 thin films.

    Science.gov (United States)

    Hwang, Dong Hyun; Cho, Shinho; Hui, Kwun Nam; Son, Young Guk

    2014-12-01

    In this study, we investigated the structural and optical properties of indium sulfide (In2S3) thin films as a substitute for the CdS buffer layer in Cu(In,Ga)Se2 (CIGS) solar cells. The In2S3 films were deposited on glass substrates using radio frequency (RF) magnetron sputtering. The sputtering power was changed from 60 to 120 W in 20 W increments. The effects of sputtering power on the crystallinity, surface morphology, and optical properties of the films were characterized with X-ray diffraction (XRD), atomic force microscopy (AFM), energy dispersive X-ray spectroscopy (EDS), and UV-visible spectrophotometry. The XRD analyses indicated that the films were polycrystalline β-In2S3 structures with two preferred orientations along the (103) and (206) directions. The AFM images revealed that the films had nanosized grains and that the size increased from 7 nm for the samples prepared at 60 W to 13 nm for those prepared at 120 W. The optical band gap of the samples was found to vary between 2.88 and 2.43 eV.

  15. The Status Quo and Development Trend of High-purity Gold Sputtering Targets

    Institute of Scientific and Technical Information of China (English)

    YANG Anheng; XIE Hongchao; ZHU Yong

    2012-01-01

    This article gives a brief introduction to manufacturers and markets of sputtering targets as well as the manufacturing technology thereof.Then,it analyzes the application of high-purity gold sputtering targets in the fields of integrated circuit,information storage,flat panel display,etc.Based on the above,the article analyzes the processing development trend for the high-purity gold sputtering targets in aspects of ultra-high purity,manufacturing technology,analysis and testing technologies.

  16. Lubrication with sputtered MoS2 films: Principles, operation, limitations

    Science.gov (United States)

    Spalvins, T.

    1991-01-01

    The present practices, limitations, and understanding of thin sputtered MoS2 films are reviewed. Sputtered MoS2 films can exhibit remarkable tribological properties such as ultralow friction coefficients (0.01) and enhanced wear lives (millions of cycles) when used in vacuum or dry air. To achieve these favorable tribological characteristics, the sputtering conditions during deposition must be optimized for adequate film adherence and appropriate structure (morphology) and composition.

  17. Life-threatening motor vehicle crashes in bright sunlight.

    Science.gov (United States)

    Redelmeier, Donald A; Raza, Sheharyar

    2017-01-01

    Bright sunlight may create visual illusions that lead to driver error, including fallible distance judgment from aerial perspective. We tested whether the risk of a life-threatening motor vehicle crash was increased when driving in bright sunlight.This longitudinal, case-only, paired-comparison analysis evaluated patients hospitalized because of a motor vehicle crash between January 1, 1995 and December 31, 2014. The relative risk of a crash associated with bright sunlight was estimated by evaluating the prevailing weather at the time and place of the crash compared with the weather at the same hour and location on control days a week earlier and a week later.The majority of patients (n = 6962) were injured during daylight hours and bright sunlight was the most common weather condition at the time and place of the crash. The risk of a life-threatening crash was 16% higher during bright sunlight than normal weather (95% confidence interval: 9-24, P vehicle crash. An awareness of this risk might inform driver education, trauma staffing, and safety warnings to prevent a life-threatening motor vehicle crash.

  18. Sky brightness and twilight measurements at Jogyakarta city, Indonesia

    Science.gov (United States)

    Herdiwijaya, Dhani

    2016-11-01

    The sky brightness measurements were performed using a portable photometer. A pocket-sized and low-cost photometer has 20 degree area measurement, and spectral ranges between 320-720 nm with output directly in magnitudes per arc second square (mass) unit. The sky brightness with 3 seconds temporal resolutions was recorded at Jogyakarta city (110° 25’ E; 70° 52’ S; elevation 100 m) within 136 days in years from 2014 to 2016. The darkest night could reach 22.61 mpass only in several seconds, with mean value 18.8±0.7 mpass and temperature variation 23.1±1.2 C. The difference of mean sky brightness between before and after midnight was about -0.76 mpass or 2.0 times brighter. Moreover, the sky brightness and temperature fluctuations were more stable in after midnight than in before midnight. It is suggested that city light pollution affects those variations, and subsequently duration of twilight. By comparing twilight brightness for several places, we also suggest a 17° solar dip or about 66 minutes before sunrise for new time of Fajr prayer.

  19. Night Sky Brightness at San Pedro Martir Observatory

    Science.gov (United States)

    Plauchu-Frayn, I.; Richer, M. G.; Colorado, E.; Herrera, J.; Córdova, A.; Ceseña, U.; Ávila, F.

    2017-03-01

    We present optical UBVRI zenith night sky brightness measurements collected on 18 nights during 2013 to 2016 and SQM measurements obtained daily over 20 months during 2014 to 2016 at the Observatorio Astronómico Nacional on the Sierra San Pedro Mártir (OAN-SPM) in México. The UBVRI data is based upon CCD images obtained with the 0.84 m and 2.12 m telescopes, while the SQM data is obtained with a high-sensitivity, low-cost photometer. The typical moonless night sky brightness at zenith averaged over the whole period is U = 22.68, B = 23.10, V = 21.84, R = 21.04, I = 19.36, and SQM = 21.88 {mag} {{arcsec}}-2, once corrected for zodiacal light. We find no seasonal variation of the night sky brightness measured with the SQM. The typical night sky brightness values found at OAN-SPM are similar to those reported for other astronomical dark sites at a similar phase of the solar cycle. We find a trend of decreasing night sky brightness with decreasing solar activity during period of the observations. This trend implies that the sky has become darker by Δ U = 0.7, Δ B = 0.5, Δ V = 0.3, Δ R=0.5 mag arcsec‑2 since early 2014 due to the present solar cycle.

  20. PROFFIT: Analysis of X-ray surface-brightness profiles

    Science.gov (United States)

    Eckert, Dominique

    2016-08-01

    PROFFIT analyzes X-ray surface-brightness profiles for data from any X-ray instrument. It can extract surface-brightness profiles in circular or elliptical annuli, using constant or logarithmic bin size, from the image centroid, the surface-brightness peak, or any user-given center, and provides surface-brightness profiles in any circular or elliptical sectors. It offers background map support to extract background profiles, can excise areas using SAO DS9-compatible (ascl:0003.002) region files to exclude point sources, provides fitting with a number of built-in models, including the popular beta model, double beta, cusp beta, power law, and projected broken power law, uses chi-squared or C statistic, and can fit on the surface-brightness or counts data. It has a command-line interface similar to HEASOFT’s XSPEC (ascl:9910.005) package, provides interactive help with a description of all the commands, and results can be saved in FITS, ROOT or TXT format.