WorldWideScience

Sample records for brightness plasma sputter

  1. Sputtering erosion in ion and plasma thrusters

    Science.gov (United States)

    Ray, Pradosh K.

    1995-08-01

    An experimental set-up to measure low-energy (below 1 keV) sputtering of materials is described. The materials to be bombarded represent ion thruster components as well as insulators used in the stationary plasma thruster. The sputtering takes place in a 9 inch diameter spherical vacuum chamber. Ions of argon, krypton and xenon are used to bombard the target materials. The sputtered neutral atoms are detected by a secondary neutral mass spectrometer (SNMS). Samples of copper, nickel, aluminum, silver and molybdenum are being sputtered initially to calibrate the spectrometer. The base pressure of the chamber is approximately 2 x 10(exp -9) Torr. the primary ion beam is generated by an ion gun which is capable of delivering ion currents in the range of 20 to 500 nA. The ion beam can be focused to a size approximately 1 mm in diameter. The mass spectrometer is positioned 10 mm from the target and at 90 deg angle to the primary ion beam direction. The ion beam impinges on the target at 45 deg. For sputtering of insulators, charge neutralization is performed by flooding the sample with electrons generated from an electron gun. Preliminary sputtering results, methods of calculating the instrument response function of the spectrometer and the relative sensitivity factors of the sputtered elements will be discussed.

  2. Plasma debris sputter resistant x-ray mirror.

    Science.gov (United States)

    Amano, Sho; Inoue, Tomoaki; Harada, Tetsuo

    2013-06-01

    A diamond-like carbon (DLC) mirror, used as a grazing incident mirror in a plasma x-ray source, exhibits a high resistance to plasma debris sputtering. Good mirror reflectivity at a wavelength of 13.5 nm was confirmed using synchrotron radiation at the NewSUBARU facility. The erosion rate due to plasma debris sputtered at the incident debris angle of 20° was measured using a laser-produced Xe plasma source developed by the authors. The results indicate that the DLC film has a 5- and 15-fold higher sputtering resistance compared to films made of the traditional mirror materials Ru and Au, respectively. Because the DLC mirror retains a high sputtering resistance to Sn ions, it may be effective in Sn plasma source applications. We conclude that a grazing incident x-ray mirror coated with DLC can be of use as a plasma debris sputtering resistant mirror.

  3. Biopolymer nanostructures induced by plasma irradiation and metal sputtering

    International Nuclear Information System (INIS)

    Modification based on polymer surface exposure to plasma treatment exhibits an easy and cheap technique for polymer surface nanostructuring. The influence of argon plasma treatment on biopolymer poly(L-lactide acid (PLLA) will be presented in this paper. The combination of Ar+ ion irradiation, consequent sputter metallization (platinum) and thermal annealing of polymer surface will be summarized. The surface morphology was studied using atomic force microscopy. The Rutherford Backscattering Spectroscopy and X-ray Photoelectron Spectroscopy were used as analytical methods. The combination of plasma treatment with consequent thermal annealing and/or metal sputtering led to the change of surface morphology and its elemental ratio. The surface roughness and composition has been strongly influenced by the modification parameters and metal layer thickness. By plasma treatment of polymer surface combined with consequent annealing or metal deposition can be prepared materials applicable both in tissue engineering as cell carriers, but also in integrated circuit manufacturing

  4. Plasma sputtering system for deposition of thin film combinatorial libraries

    Science.gov (United States)

    Cooper, James S.; Zhang, Guanghai; McGinn, Paul J.

    2005-06-01

    The design of a plasma sputtering system for the deposition of combinatorial libraries is described. A rotating carousel is used to position shadow masks between the targets and the substrate. Multilayer films are built up by depositing sequentially through various masks. Postdeposition annealing is used to promote interdiffusion of the layered structures. Either discrete or compositional gradient libraries can be deposited in this system. Samples appropriate for characterization with a scanning electrochemical microscope or a multichannel microelectrode array system can be produced. The properties of some deposited Pt-Ru films for fuel cell applications are described.

  5. Method and apparatus for sputtering with a plasma lens

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2016-09-27

    A plasma lens for enhancing the quality and rate of sputter deposition onto a substrate is described herein. The plasma lens serves to focus positively charged ions onto the substrate while deflecting negatively charged ions, while at the same time due to the line of sight positioning of the lens, allowing for free passage of neutrals from the target to the substrate. The lens itself is formed of a wound coil of multiple turns, inside of which are deposed spaced lens electrodes which are electrically paired to impress an E field overtop the B field generated by the coil, the potential applied to the electrodes increasing from end to end towards the center of the lens, where the applied voltage is set to a high potential at the center electrodes as to produce a potential minimum on the axis of the lens.

  6. Plasma-ion Induced Sputtering and Heating of Titan's Atmosphere

    Science.gov (United States)

    Johnson, R. E.; Tucker, O. J.

    2007-05-01

    Titan is unique among the outer solar system icy satellites in having an atmosphere with a column density about ten times that of the Earth's atmosphere and an atmospheric mass to solid mass ratio comparable to that of Venus. Atmospheres equivalent in size to that at Titan would have been removed from the icy Galilean satellites by the plasma trapped in the Jovian magnetosphere (Johnson 2004). Therefore, the use of Cassini data to determine the present erosion rate of Titan's atmosphere provides an important end point for studying the erosion and heating of planetary and satellite atmospheres by an ambient plasma. In this paper we describe the deposition of energy, the erosion and the expansion of the upper atmosphere of Titan using Direct Simulation Monte Carlo models (Shematovich et al. 2003; Michael et al. 2005; Michael and Johnson 2005). These calculations are used to calibrate semi-empirical models of atmospheric sputtering (Johnson 1994) that are used to interpret Cassini data at Titan. Using a number of plasma conditions, the temperature and density vs. altitude above the exobase and the rate of escape are calculated. References: Johnson, R.E. "Plasma-induced Sputtering of an Atmosphere" in Space Science Reviews 69 215-253 (1994). Johnson. R.E., " The magnetospheric plasmadriven evolution of satellite atmospheres" Astrophys. J. 609, L99-L102 (2004). Michael, M. and R.E. Johnson, "Energy deposition of pickup ions and heating of Titan's atmosphere", Planetary & Space Sci.53, 1510-1514 (2005). Michael M., R.E. Johnson, F. Leblanc, M. Liu, J.G. Luhmann, and V.I. Shematovich, "Ejection of nitrogen from Titan's atmosphere by magnetospheric ions and pick-up ions", Icarus 175, 263-267 (2005). Shematovich, V.I., R.E. Johnson, M. Michael, and J.G. Luhmann, "Nitrogen loss from Titan", JGR 108, No. E8, 5087, doi:10.1029/2003JE002094 (2003).

  7. A feedback model of magnetron sputtering plasmas in HIPIMS

    Science.gov (United States)

    Ross, A. E.; Ganesan, R.; Bilek, M. M. M.; McKenzie, D. R.

    2015-04-01

    We present a 1D feedback model that captures the essential elements of plasma pulse initiation and is useful for control and diagnostics of sputtering plasmas. Our model falls into the class of single-species population models with recruitment and time delay, which show no oscillatory behaviour. The model can reproduce essential features of published time-current traces from plasma discharges and is useful to determine the key parameters affecting the evolution of the discharge. We include the external circuit and we focus on the time evolution of the current as a function of the applied voltage and the plasma parameters. We find the necessity of a nonlinear loss term in the time-dependent plasma ion population to ensure a stable discharge, and we show that a higher secondary electron emission coefficient reduces the time delay for current initiation. We report that I-V characteristics in the plateau region, where it exists, fit a power curve of the form I = kVn, where n is influenced most strongly by the nonlinear loss term.

  8. Plasma potential mapping of high power impulse magnetron sputtering discharges

    Energy Technology Data Exchange (ETDEWEB)

    Rauch, Albert; Mendelsberg, Rueben J.; Sanders, Jason M.; Anders, Andre

    2011-12-20

    Pulsed emissive probe techniques have been used to determine the plasma potential distribution of high power impulse magnetron sputtering (HiPIMS) discharges. An unbalanced magnetron with a niobium target in argon was investigated for pulse length of 100 μs at a pulse repetition rate of 100 Hz, giving a peak current of 170 A. The probe data were taken with a time resolution of 20 ns and a spatial resolution of 1 mm. It is shown that the local plasma potential varies greatly in space and time. The lowest potential was found over the target’s racetrack, gradually reaching anode potential (ground) several centimeters away from the target. The magnetic pre-sheath exhibits a funnel-shaped plasma potential resulting in an electric field which accelerates ions toward the racetrack. In certain regions and times, the potential exhibits weak local maxima which allow for ion acceleration to the substrate. Knowledge of the local E and static B fields lets us derive the electrons’ E×B drift velocity, which is about 105 m/s and shows structures in space and time.

  9. Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

    Energy Technology Data Exchange (ETDEWEB)

    Chan, K.-Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)], E-mail: k.y.chan@fz-juelich.de; Luo, P.-Q.; Zhou, Z.-B. [Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, 200240 Shanghai (China); Tou, T.-Y.; Teo, B.-S. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2009-03-01

    Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.

  10. Focused ion beams using a high-brightness plasma source

    Science.gov (United States)

    Guharay, Samar

    2002-10-01

    High-brightness ion beams, with low energy spread, have merits for many new applications in microelectronics, materials science, and biology. Negative ions are especially attractive for the applications that involve beam-solid interactions. When negative ions strike a surface, especially an electrically isolated surface, the surface charging voltage is limited to few volts [1]. This property can be effectively utilized to circumvent problems due to surface charging, such as device damage and beam defocusing. A compact plasma source, with the capability to deliver either positive or negative ion beams, has been developed. H- beams from this pulsed source showed brightness within an order of magnitude of the value for beams from liquid-metal ion sources. The beam angular intensity is > 40 mAsr-1 and the corresponding energy spread is 1 Acm-2 and a spot size of 100 nm. Such characteristics of focused beam parameters, using a dc source, will immediately open up a large area of new applications. [1] P. N. Guzdar, A. S. Sharma, S. K. Guharay, "Charging of substrates irradiated by particle beams" Appl. Phys. Lett. 71, 3302 (1997). [2] S. K. Guharay, E. Sokolovsky, J. Orloff, "Characteristics of ion beams from a Penning source for focused ion beam applications" J. Vac. Sci Technol. B17, 2779 (1999).

  11. Molecular Dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition

    OpenAIRE

    Xie, Lu; Brault, Pascal; Bauchire, Jean-Marc; Thomann, Anne-Lise; Bedra, Larbi

    2014-01-01

    International audience Carrying out molecular Dynamics simulations is a relevant way for understanding growth phenomena at the atomic scale. Initial conditions are defined for reproducing deposition conditions of plasma sputtering experiments. Two case studies are developed for highlighting the implementation of molecular dynamics simulations in the context of plasma sputtering deposition: ZrxCu1-x metallic glass and AlCoCrCuFeNi high entropy alloy thin films deposited onto silicon. Effect...

  12. Plasma optical emission spectroscopy diagnostic during amorphous silicon thin films deposition by Rf sputtering technique

    International Nuclear Information System (INIS)

    This paper deals with the study of the glow discharge, used for amorphous silicon thin films deposition by Rf sputtering technique. The produced plasma is investigated by mean of the optical emission spectroscopy (OES) analysis. Different plasmas obtained with changing the gas pressure and Rf powers were analysed at different positions in the inter-electrode space. Emission lines from Ar, Si, Si+ and Ar+ were observed in the visible region. It was found that emission intensities of all the observed lines have a spatial Gaussian shape. The maximum intensity is located in the core of the plasma and decrease in the electrodes region. The ratio between the Si and Ar+ intensities (ISi/IAr+), in the target region, is proposed as a new tool to estimate the Ar sputtering yield. This ratio was compared to the theoretical calculated sputtering yield. The difference between these two quantities is exploited to determine the contribution of fast Ar neutrals in the sputtering process.

  13. View factor modeling of sputter-deposition on micron-scale-architectured surfaces exposed to plasma

    Science.gov (United States)

    Huerta, C. E.; Matlock, T. S.; Wirz, R. E.

    2016-03-01

    The sputter-deposition on surfaces exposed to plasma plays an important role in the erosion behavior and overall performance of a wide range of plasma devices. Plasma models in the low density, low energy plasma regime typically neglect micron-scale surface feature effects on the net sputter yield and erosion rate. The model discussed in this paper captures such surface architecture effects via a computationally efficient view factor model. The model compares well with experimental measurements of argon ion sputter yield from a nickel surface with a triangle wave geometry with peak heights in the hundreds of microns range. Further analysis with the model shows that increasing the surface pitch angle beyond about 45° can lead to significant decreases in the normalized net sputter yield for all simulated ion incident energies (i.e., 75, 100, 200, and 400 eV) for both smooth and roughened surfaces. At higher incident energies, smooth triangular surfaces exhibit a nonmonotonic trend in the normalized net sputter yield with surface pitch angle with a maximum yield above unity over a range of intermediate angles. The resulting increased erosion rate occurs because increased sputter yield due to the local ion incidence angle outweighs increased deposition due to the sputterant angular distribution. The model also compares well with experimentally observed radial expansion of protuberances (measuring tens of microns) in a nano-rod field exposed to an argon beam. The model captures the coalescence of sputterants at the protuberance sites and accurately illustrates the structure's expansion due to deposition from surrounding sputtering surfaces; these capabilities will be used for future studies into more complex surface architectures.

  14. Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities

    NARCIS (Netherlands)

    Bystrov, K.; Morgan, T. W.; Tanyeli, I.; De Temmerman, G.; M. C. M. van de Sanden,

    2013-01-01

    We report measurements of chemical sputtering yields of graphite exposed to low temperature nitrogen plasmas. The influence of surface temperature and incoming ion energy on the sputtering yields has been investigated in two distinct ion flux density regimes. Sputtering yields grow consistently with

  15. Investigations into the Anti-Felting Properties of Sputtered Wool Using Plasma Treatment

    Science.gov (United States)

    M. Borghei, S.; Shahidi, S.; Ghoranneviss, M.; Abdolahi, Z.

    2013-01-01

    In this research the effects of mordant and plasma sputtering treatments on the crystallinity and morphological properties of wool fabrics were investigated. The felting behavior of the treated samples was also studied. We used madder as a natural dye and copper sulfate as a metal mordant. We also used copper as the electrode material in a DC magnetron plasma sputtering device. The anti-felting properties of the wool samples before and after dying was studied, and it was shown that the shrink resistance and anti-felting behavior of the wool had been significantly improved by the plasma sputtering treatment. In addition, the percentage of crystallinity and the size of the crystals were investigated using an X-ray diffractometer, and a scanning electron microscope was used for morphological analysis. The amount of copper particles on the surface of the mordanted and sputtered fabrics was studied using the energy dispersive X-ray (EDX) method, and the hydrophobic properties of the samples were examined using the water drop test. The results show that with plasma sputtering treatment, the hydrophobic properties of the surface of wool become super hydrophobic.

  16. Nanostructure growth by helium plasma irradiation to tungsten in sputtering regime

    International Nuclear Information System (INIS)

    The formation of nanostructure on tungsten (W) surface due to Helium (He) plasma irradiation can be harmful for fusion reactors. Up to now, W nanostructure growth was investigated mainly without sputtering. Under sputtering regime, nanostructure growth competes with erosion due to sputtering. In this study, the nanostructure growth was investigated in the linear divertor simulator NAGDIS-II at incident ion energy range of 200–500 eV. The growth of nanostructures was investigated by experiments and calculations under the sputtering regime. With increasing incident ion energy, the thickness of nanostructured W layer saturated rapidly at a lower He fluence, resulting in thinner W nanostructured layer. The erosion rate of the top of the W nanostructured layer was obtained from the comparison with the numerical calculation

  17. Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model

    International Nuclear Information System (INIS)

    The MCI transport model was used to compare chemical and physical sputtering for a DIII-D divertor plasma near detachment. With physical sputtering alone the integrated carbon influx was 8.4 x 1019 neutral/s while physical plus chemical sputtering produced an integrated carbon influx of 1.7 x 1021 neutrals/s. The average carbon concentration in the computational volume increased from 0.012% with only physical sputtering to 0.182% with both chemical and physical sputtering. This increase in the carbon inventory produced more radiated power which is in better agreement with experimental measurements

  18. A condition for scrape-off plasmas in self-sputtering

    International Nuclear Information System (INIS)

    Behavior of self-sputtered impurities from limiters or divertor neutralizer plates was investigated. The upper limit of boundary plasma temperature determined under the condition that the impurities of wall materials was not on increase is shown to be low. (author)

  19. The diffusion transfer of sputtered atoms in plasma spraying on the internal cylindrical surface

    International Nuclear Information System (INIS)

    The sputtering of the surface of the solid by the glow discharge plasma is used widely in the electronics for the deposition of thin films. The sputtered atoms (SA), leaving the surface, clash with the gas atoms and the granules the energy. It is interesting to examine the effect of the condensation coefficient of the SA on the concentration of the SA in the cylindrical discharge volume and the fluxes of the SA to different areas of the wall. The solution of this problem for the case of the diffusion transfer of the SA is the subject of this work

  20. PdAu/C catalysts prepared by plasma sputtering for the electro-oxidation of glycerol

    OpenAIRE

    Mougenot, Mathieu; Caillard, Amaël; Simoes, Mario; Baranton, Steve; Coutanceau, Christophe; Brault, Pascal

    2011-01-01

    Co-sputtered Pd0.7Au0.3 catalyst and alternate sputtered Pd0.35Au0.3Pd0.35 and Au0.15Pd0.7Au0.15 materials were prepared by plasma deposition of Au and Pd atoms on a carbon diffusion layer. Atomic composition and metal loadings were evaluated from EDX and RBS, respectively. The low amount of metal deposited and the resulting low metallic film thickness made TEM and XRD characterizations difficult to perform, therefore, catalyst microstructures and surface compositions were determined from ele...

  1. Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ehiasarian, Arutiun P; Andersson, Joakim; Anders, Andr& #233

    2010-04-18

    The plasma composition of high power impulse magnetron sputtering (HIPIMS) has been studied for titanium and chromium targets using a combined energy analyser and quadrupole mass spectrometer. Measurements were done at distances from 50 to 300 mm from the sputtering target. Ti and Cr are similar in atomic mass but have significantly different sputter yields, which gives interesting clues on the effect of the target on plasma generation and transport of atoms. The Ti and Cr HIPIMS plasmas operated at a peak target current density of ~;;0.5 A cm-2. The measurements of the argon and metal ion content as well as the ion energy distribution functions showed that (1) singly and doubly charged ions were found for argon as well as for the target metal, (2) the majority of ions were singly charged argon for both metals at all distances investigated, (3) the Cr ion density was maintained to distances further from the target than Ti. Gas rarefaction was identified as a main factor promoting transport of metal ions, with the stronger effect observed for Cr, the material with higher sputter yield. Cr ions were found to displace a significant portion of the gas ions, whereas this was less evident in the Ti case. The observations indicate that the presence of metal vapour promotes charge exchange and reduces the electron temperature and thereby practically prevents the production of Ar2+ ions near the target. The content of higher charge states of metal ions depends on the probability of charge exchange with argon.

  2. A sputtered zirconia primer for improved thermal shock resistance of plasma-sprayed ceramic turbine seals

    Science.gov (United States)

    Bill, R. C.; Sovey, J.; Allen, G. P.

    1981-01-01

    It is shown that the application of sputtered Y2O3-stabilized ZrO2 (YSZ) primer in plasma-sprayed YSZ ceramic-coated turbine blades results in an improvement, by a factor of 5-6, in the thermal shock life of specimens with a sprayed, porous, Ni-Cr-Al-Y intermediate layer. Species with and without the primer were found to be able to survive 1000 cycles when the intermediate layer was used, but reduced laminar cracking was observed in the specimen with the primer. It is suggested that the sputtered YZS primer-induced properties are due to (1) more effective wetting and adherence of the plasma-sprayed YZS particles to the primer, and (2) the primer's retardation of impinging, molten plasma sprayed particles solidification rates, which result in a less detrimental residual stress distribution.

  3. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

    Energy Technology Data Exchange (ETDEWEB)

    Macak, Karol [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Kouznetsov, Vladimir [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Schneider, Jochen [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Helmersson, Ulf [Department of Physics, Linkoeping University, SE-581 83 Linkoeping, (Sweden); Petrov, Ivan [Materials Science Department and Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States)

    2000-07-01

    Time resolved plasma probe measurements of a novel high power density pulsed plasma discharge are presented. Extreme peak power densities in the pulse (on the order of several kW cm{sup -2}) result in a very dense plasma with substrate ionic flux densities of up to 1 A cm{sup -2} at source-to-substrate distances of several cm and at a pressure of 0.13 Pa (1 mTorr). The pulse duration was {approx}100 {mu}s with a pulse repetition frequency of 50 Hz. The plasma consists of metallic and inert gas ions, as determined from time resolved Langmuir probe measurements and in situ optical emission spectroscopy data. It was found that the plasma composition at the beginning of the pulse was dominated by Ar ions. As time elapsed metal ions were detected and finally dominated the ion composition. The effect of the process parameters on the temporal development of the ionic fluxes is discussed. The ionized portion of the sputtered metal flux was found to have an average velocity of 2500 m s{sup -1} at 6 cm distance from the source, which conforms to the collisional cascade sputtering theory. The degree of ionization of the sputtered metal flux at a pressure of 0.13 Pa was found to be 40%{+-}20% by comparing the total flux of deposited atoms with the charge measured for the metal ions in the pulse. (c) 2000 American Vacuum Society.

  4. Plasma properties during magnetron sputtering of lithium phosphorous oxynitride thin films

    DEFF Research Database (Denmark)

    Christiansen, Ane Sælland; Stamate, Eugen; Thydén, Karl Tor Sune;

    2015-01-01

    The nitrogen dissociation and plasma parameters during radio frequency sputtering of lithium phosphorus oxynitride thin films in nitrogen gas are investigated by mass appearance spectrometry, electrostatic probes and optical emission spectroscopy, and the results are correlated with electrochemical...... that correlates with a higher ionic conductivity. Despite of lower plasma density the film grows faster at lower pressure where the higher plasma potential, translated into higher energy for impinging ions on the substrate, resulted in a compact and smooth film structure. Higher pressures showed much less...... nitrogen dissociation and lower ion energy with thinner films, less ionic conductivity and poor film structure with large roughness....

  5. Sputtering deposition of i to thin films by ecr plasma source

    Energy Technology Data Exchange (ETDEWEB)

    Toshiaki, Yasui; Hirokazu, Tahara; Takao, Yoshikawa [Osaka Univ., Graduate School of Engineering Science, Toyonaka (Japan)

    2001-07-01

    ITO thin film was deposited by sheet shaped electron cyclotron resonance (ECR) plasma. The plasma source is composed of slot antennas on a rectangular waveguide, permanent magnets around the slots and a target within the discharge chamber. Microwaves of 2.45 GHz are radiated from the slots and generated plasma along the waveguide. With Ar sputtering, ITO thin films were deposited with thickness uniformity of {+-} 4.4 % within 120 mm and deposition rate of 2.75 nm/min. Its resistivity was about 4 x 10{sup -4} x cm, and its transparency was above 70 % at 550 nm without glass substrate. (authors)

  6. A sputtered zirconia primer for improved thermal shock resistance of plasma sprayed ceramic turbine seals

    Science.gov (United States)

    Bill, R. C.; Sovey, J.; Allen, G. P.

    1981-01-01

    The development of plasma-sprayed yttria stabilized zirconia (YSZ) ceramic turbine blade tip seal components is discussed. The YSZ layers are quite thick (0.040 to 0.090 in.). The service potential of seal components with such thick ceramic layers is cyclic thermal shock limited. The most usual failure mode is ceramic layer delamination at or very near the interface between the plasma sprayed YSZ layer and the NiCrAlY bondcoat. Deposition of a thin RF sputtered YSZ primer to the bondcoat prior to deposition of the thick plasma sprayed YSZ layer was found to reduce laminar cracking in cyclic thermal shock testing. The cyclic thermal shock life of one ceramic seal design was increased by a factor of 5 to 6 when the sputtered YSZ primer was incorporated. A model based on thermal response of plasma sprayed YSZ particles impinging on the bondcoat surface with and without the sputtered YSZ primer provides a basis for understanding the function of the primer.

  7. Properties of AlN films deposited by reactive ion-plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Bert, N. A.; Bondarev, A. D.; Zolotarev, V. V.; Kirilenko, D. A.; Lubyanskiy, Ya. V.; Lyutetskiy, A. V.; Slipchenko, S. O.; Petrunov, A. N.; Pikhtin, N. A., E-mail: nike@hpld.ioffe.ru; Ayusheva, K. R.; Arsentyev, I. N.; Tarasov, I. S. [Russian Academy of Sciences, Ioffe Physical–Technical Institute (Russian Federation)

    2015-10-15

    The properties of SiO{sub 2}, Al{sub 2}O{sub 3}, and AlN dielectric coatings deposited by reactive ion-plasma sputtering are studied. The refractive indices of the dielectric coatings are determined by optical ellipsometry. It is shown that aluminum nitride is the optimal material for achieving maximum illumination of the output mirror of a semiconductor laser. A crystalline phase with a hexagonal atomic lattice and oxygen content of up to 10 at % is found by transmission electron microscopy in the aluminum-nitride films. It is found that a decrease in the concentration of residual oxygen in the chamber of the reactive ion-plasma sputtering installation makes it possible to eliminate the appearance of vertical pores in the bulk of the aluminum-nitride film.

  8. Brightness enhancement of plasma ion source by utilizing anode spot for nano applications

    Energy Technology Data Exchange (ETDEWEB)

    Park, Yeong-Shin; Lee, Yuna; Chung, Kyoung-Jae; Hwang, Y. S. [Department of Nuclear Engineering, Seoul National University, Seoul 151-742 (Korea, Republic of); Kim, Yoon-Jae [Samsung Electronics Co. Ltd., Gyeonggi 445-701 (Korea, Republic of); Park, Man-Jin [Research Institute of Nano Manufacturing System, Seoul National University of Science and Technology, Seoul 139-743 (Korea, Republic of); Moon, Dae Won [Nanobio Fusion Research Center, Korea Research Institute of Standards and Science, Daejeon 305-600 (Korea, Republic of)

    2012-02-15

    Anode spots are known as additional discharges on positively biased electrode immersed in plasmas. The anode spot plasma ion source (ASPIS) has been investigated as a high brightness ion source for nano applications such as focused ion beam (FIB) and nano medium energy ion scattering (nano-MEIS). The generation of anode spot is found to enhance brightness of ion beam since the anode spot increases plasma density near the extraction aperture. Brightness of the ASPIS has been estimated from measurement of emittance for total ion beam extracted through sub-mm aperture. The ASPIS is installed to the FIB system. Currents and diameters of the focused beams with/without anode spot are measured and compared. As the anode spot is turned on, the enhancement of beam current is observed at fixed diameter of the focused ion beam. Consequently, the brightness of the focused ion beam is enhanced as well. For argon ion beam, the maximum normalized brightness of 12 300 A/m{sup 2} SrV is acquired. The ASPIS is applied to nano-MEIS as well. The ASPIS is found to increase the beam current density and the power efficiency of the ion source for nano-MEIS. From the present study, it is shown that the ASPIS can enhance the performance of devices for nano applications.

  9. Structuring of DLC:Ag nanocomposite thin films employing plasma chemical etching and ion sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Tamulevičius, Tomas, E-mail: Tomas.Tamulevicius@ktu.lt; Tamulevičienė, Asta; Virganavičius, Dainius; Vasiliauskas, Andrius; Kopustinskas, Vitoldas; Meškinis, Šarūnas; Tamulevičius, Sigitas

    2014-12-15

    Highlights: • CF{sub 4}/O{sub 2} dry etching of DLC:Ag films revealed the embedded Ag nanoparticles. • Plasma processed samples with more than 5 at.% Ag demonstrated Ostwald ripening. • 4 μm period patterns in aluminum and photoresist were imposed in the DLC:Ag film. • Different micro patterns are formed depending on the selected processing route. - Abstract: We analyze structuring effects of diamond like carbon based silver nanocomposite (DLC:Ag) thin films by CF{sub 4}/O{sub 2} plasma chemical etching and Ar{sup +} sputtering. DLC:Ag films were deposited employing unbalanced reactive magnetron sputtering of silver target with Ar{sup +} in C{sub 2}H{sub 2} gas atmosphere. Films with different silver content (0.6–12.9 at.%) were analyzed. The films (as deposited and exposed to plasma chemical etching) were characterized employing scanning electron microscopy and energy dispersive X-ray analysis (SEM/EDS), optical microscopy, ultraviolet–visible light (UV–VIS) spectroscopy and Fourier transform infrared (FTIR) spectroscopy. After deposition, the films were plasma chemically etched in CF{sub 4}/O{sub 2} mixture plasma for 2–6 min. It is shown that optical properties of thin films and silver nano particle size distribution can be tailored during deposition changing the magnetron current and C{sub 2}H{sub 2}/Ar ratio or during following plasma chemical etching. The plasma etching enabled to reveal the silver filler particle size distribution and to control silver content on the surface that was found to be dependent on Ostwald ripening process of silver nano-clusters. Employing contact lithography and 4 μm period mask in photoresist or aluminum the films were patterned employing CF{sub 4}/O{sub 2} mixture plasma chemical etching, direct Ar{sup +} sputtering or combined etching processes. It is shown that different processing recipes result in different final grating structures. Selective carbon etching in CF{sub 4}/O{sub 2} gas mixture with

  10. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Yuchen [State Key Lab for Materials Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Zhou, Xue [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Electrical Engineering, Harbin Institute of Technology, Harbin 150000 (China); Liu, Jason X. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States); Department of Physics, University of California, Berkeley, Berkeley, California 94720 (United States); Anders, André, E-mail: aanders@lbl.gov [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

    2016-01-18

    We present evidence for breathing modes in magnetron sputtering plasmas: periodic axial variations of plasma parameters with characteristic frequencies between 10 and 100 kHz. A set of azimuthally distributed probes shows synchronous oscillations of the floating potential. They appear most clearly when considering the intermediate current regime in which the direction of azimuthal spoke motion changes. Breathing oscillations were found to be superimposed on azimuthal spoke motion. Depending on pressure and current, one can also find a regime of chaotic fluctuations and one of stable discharges, the latter at high current. A pressure-current phase diagram for the different situations is proposed.

  11. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XU Jun; GAO Peng; DING Wan-yu; LI Xin; DENG Xin-lu; DONG Chuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  12. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  13. Evidence for breathing modes in direct current, pulsed, and high power impulse magnetron sputtering plasmas

    International Nuclear Information System (INIS)

    We present evidence for breathing modes in magnetron sputtering plasmas: periodic axial variations of plasma parameters with characteristic frequencies between 10 and 100 kHz. A set of azimuthally distributed probes shows synchronous oscillations of the floating potential. They appear most clearly when considering the intermediate current regime in which the direction of azimuthal spoke motion changes. Breathing oscillations were found to be superimposed on azimuthal spoke motion. Depending on pressure and current, one can also find a regime of chaotic fluctuations and one of stable discharges, the latter at high current. A pressure-current phase diagram for the different situations is proposed

  14. Influence of bias on properties of carbon films deposited by MCECR plasma sputtering method

    Institute of Scientific and Technical Information of China (English)

    CAI Chang-long; DIAO Dong-feng; S.Miyake; T.Matsumoto

    2004-01-01

    The mirror-confinement-type electron cyclotron resonance(MCECR) plasma source has high plasma density and high electron temperature. It is quite useful in many plasma processing, and has been used for etching and thin-film deposition. The carbon films with 40 nm thickness were deposited by MCECR plasma sputtering method on Si, and the influence of substrate bias on the properties of carbon films was studied. The bonding structure of the film was analyzed by the X-ray photoelectron spectroscopy(XPS), the tribological properties were measured by the pin-on-disk(POD) tribometer, the nanohardness of the films was measured by the nanoindenter, and the deposition speed and the refractive index were measured by the ellipse meter. The better substrate bias was obtained, and the better properties of carbon films were obtained.

  15. Composite materials obtained by the ion-plasma sputtering of metal compound coatings on polymer films

    Science.gov (United States)

    Khlebnikov, Nikolai; Polyakov, Evgenii; Borisov, Sergei; Barashev, Nikolai; Biramov, Emir; Maltceva, Anastasia; Vereshchagin, Artem; Khartov, Stas; Voronin, Anton

    2016-01-01

    In this article, the principle and examples composite materials obtained by deposition of metal compound coatings on polymer film substrates by the ion-plasma sputtering method are presented. A synergistic effect is to obtain the materials with structural properties of the polymer substrate and the surface properties of the metal deposited coatings. The technology of sputtering of TiN coatings of various thicknesses on polyethylene terephthalate films is discussed. The obtained composites are characterized by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and scanning tunneling microscopy (STM) is shown. The examples of application of this method, such as receiving nanocomposite track membranes and flexible transparent electrodes, are considered.

  16. Bright high-order harmonic generation with controllable polarization from a relativistic plasma mirror

    CERN Document Server

    Chen, Zi-Yu

    2016-01-01

    Ultrafast extreme ultraviolet (XUV) sources with controllable polarization state are powerful tools in investigating not only structural and electronic, but also magnetic properties of materials. However, such light sources are still limited to a few free electron laser facilities and very recently to high-order harmonic generation (HHG) from noble gases. Here we propose and numerically demonstrate a new laser-plasma scheme to generate bright XUV pulses with fully controlled polarization. An elliptically polarized laser pulse is obliquely incident on a plasma surface. The reflected radiation contains trains and isolated circularly or highly elliptically polarized attosecond XUV pulses. The harmonic polarization state is fully controlled by the laser-plasma parameters. The mechanism can be explained within the relativistically oscillating mirror model. This scheme opens a practical and promising route to generate bright attosecond XUV pulses with desirable ellipticities in a straightforward and efficient way f...

  17. Bright high-order harmonic generation with controllable polarization from a relativistic plasma mirror.

    Science.gov (United States)

    Chen, Zi-Yu; Pukhov, Alexander

    2016-01-01

    Ultrafast extreme ultraviolet (XUV) sources with a controllable polarization state are powerful tools for investigating the structural and electronic as well as the magnetic properties of materials. However, such light sources are still limited to only a few free-electron laser facilities and, very recently, to high-order harmonic generation from noble gases. Here we propose and numerically demonstrate a laser-plasma scheme to generate bright XUV pulses with fully controlled polarization. In this scheme, an elliptically polarized laser pulse is obliquely incident on a plasma surface, and the reflected radiation contains pulse trains and isolated circularly or highly elliptically polarized attosecond XUV pulses. The harmonic polarization state is fully controlled by the laser-plasma parameters. The mechanism can be explained within the relativistically oscillating mirror model. This scheme opens a practical and promising route to generate bright attosecond XUV pulses with desirable ellipticities in a straightforward and efficient way for a number of applications. PMID:27531047

  18. Study on re-sputtering during CN{sub x} film deposition through spectroscopic diagnostics of plasma

    Energy Technology Data Exchange (ETDEWEB)

    Liang, Peipei; Yang, Xu; Li, Hui; Cai, Hua [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Sun, Jian; Xu, Ning [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Wu, Jiada, E-mail: jdwu@fudan.edu.cn [Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China); Shanghai Engineering Research Center of Ultra-Precision Optical Manufacturing, Fudan University, Shanghai 200433 (China); Engineering Research Center of Advanced Lighting Technology, Ministry of Education, Fudan University, Shanghai 200433 (China)

    2015-10-15

    A nitrogen-carbon plasma was generated during the deposition of carbon nitride (CN{sub x}) thin films by pulsed laser ablation of a graphite target in a discharge nitrogen plasma, and the optical emission of the generated nitrogen-carbon plasma was measured for the diagnostics of the plasma and the characterization of the process of CN{sub x} film deposition. The nitrogen-carbon plasma was recognized to contain various species including nitrogen molecules and molecular ions excited in the ambient N{sub 2} gas, carbon atoms and atomic ions ablated from the graphite target and CN radicals. The temporal evolution and spatial distribution of the CN emission and their dependence on the substrate bias voltage show two groups of CN radicals flying in opposite directions. One represents the CN radicals formed as the products of the reactions occurring in the nitrogen-carbon plasma, revealing the reactive deposition of CN{sub x} film due to the reactive expansion of the ablation carbon plasma in the discharge nitrogen plasma and the effective formation of gaseous CN radicals as precursors for CN{sub x} film growth. The other one represents the CN radicals re-sputtered from the growing CN{sub x} film by energetic plasma species, evidencing the re-sputtering of the growing film accompanying film growth. And, the re-sputtering presents ion-induced sputtering features.

  19. Radioactive sputter cathodes for {sup 32}P plasma-based ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Fortin, M.A. [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec, J3X 1S2 (Canada)]. E-mail: fortin@bms.uu.se; Paynter, R.W. [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec, J3X 1S2 (Canada); Sarkissian, A. [Plasmionique Inc., 1650 boul. Lionel Boulet, Varennes, Quebec, J3X 1S2 (Canada); Stansfield, B.L. [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec, J3X 1S2 (Canada)

    2006-05-15

    The development of clinical treatments involving the use of beta-emitting millimetric and sub-millimetric devices has been a continuing trend in nuclear medicine. Implanted a few nanometers below the surface of endovascular implants, seeds or beads, beta-emitting radioisotopes can be used in a variety of biomedical applications. Recently, new technologies have emerged to enable the rapid and efficient activation of such devices. A pulsed, coaxial electron cyclotron resonance plasma reactor was designed and tested to demonstrate the feasibility of plasma-based radioactive ion implantation (PBRII). It has been shown that such plasma reactors allow for the implantation of radioisotopes ({sup 32}P) into biomedical devices with higher efficiencies than those obtained with conventional ion beams. Fragments containing radioactive atoms are produced in the implanter by means of a negatively biased solid sputter cathode that is inserted into an argon plasma. Dilute orthophosphoric acid solutions (H{sub 3} {sup 32}PO{sub 4}) are used for the fabrication of flat sputter targets, since they offer a high radioisotope content. However, the aggregation of the radioactive solute into highly hygroscopic ring-like deposits rather than flat, thin radioactive films is observed on certain substrates. This article describes the effect of this nonuniform distribution of the radioisotopes on the efficiency of PBRII, and presents a technique which enables a better distribution of {sup 32}P by coating the substrates with iron. The iron coating is shown to enable optimal radioisotope sputtering rates, which are essential in {sup 32}P-PBRII for the efficient activation of millimetric biomedical devices such as stents or coils.

  20. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    OpenAIRE

    Trieschmann, Jan; Schmidt, Frederik; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo me...

  1. Control of composition and crystallinity in hydroxyapatite films deposited by electron cyclotron resonance plasma sputtering

    Science.gov (United States)

    Akazawa, Housei; Ueno, Yuko

    2014-01-01

    Hydroxyapatite (HAp) films were deposited by electron cyclotron resonance plasma sputtering under a simultaneous flow of H2O vapor gas. Crystallization during sputter-deposition at elevated temperatures and solid-phase crystallization of amorphous films were compared in terms of film properties. When HAp films were deposited with Ar sputtering gas at temperatures above 460 °C, CaO byproducts precipitated with HAp crystallites. Using Xe instead of Ar resolved the compositional problem, yielding a single HAp phase. Preferentially c-axis-oriented HAp films were obtained at substrate temperatures between 460 and 500 °C and H2O pressures higher than 1×10-2 Pa. The absorption signal of the asymmetric stretching mode of the PO43- unit (ν3) in the Fourier-transform infrared absorption (FT-IR) spectra was the narrowest for films as-crystallized during deposition with Xe, but widest for solid-phase crystallized films. While the symmetric stretching mode of PO43- (ν1) is theoretically IR-inactive, this signal emerged in the FT-IR spectra of solid-phase crystallized films, but was absent for as-crystallized films, indicating superior crystallinity for the latter. The Raman scattering signal corresponding to ν1 PO43- sensitively reflected this crystallinity. The surface hardness of as-crystallized films evaluated by a pencil hardness test was higher than that of solid-phase crystallized films.

  2. Deposition of nanostructured fluorocarbon plasma polymer films by RF magnetron sputtering of polytetrafluoroethylene

    Energy Technology Data Exchange (ETDEWEB)

    Kylian, Ondrej, E-mail: ondrej.kylian@gmail.com; Drabik, Martin; Polonskyi, Oleksandr; Cechvala, Juraj; Artemenko, Anna; Gordeev, Ivan; Choukourov, Andrei; Matolinova, Iva; Slavinska, Danka; Biederman, Hynek, E-mail: bieder@kmf.troja.mff.cuni.cz

    2011-07-29

    The RF magnetron sputtering of polytetrafluoroethylene target is studied with the aim to find out conditions leading to the deposition of super-hydrophobic thin films. It is shown that such coatings can be prepared at elevated pressures and a longer distance between the sputtered target and the substrate. This is explained by an increase in the density of longer C{sub x}F{sub y} molecules that reach the substrate and a lower flux of ions and CF{sub 2} radicals on the surface of growing film under such deposition conditions, as observed by optical emission spectroscopy and mass spectrometry. Such changes in plasma composition result in a deposition of rough films having F/C ratio close to 2 as observed by scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. These findings clearly distinguish our results from the previous investigations of polytetrafluoroethylene sputtering performed at shorter distances from the target, where either low F/C ratio or low roughness of the deposited films did not allow reaching super-hydrophobic character of the coatings.

  3. Particle-in-Cell/Test-Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

    CERN Document Server

    Trieschmann, Jan; Mussenbrock, Thomas

    2016-01-01

    The paper provides a tutorial to the conceptual layout of a self-consistently coupled Particle-In-Cell/Test-Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is actually needed and which numerical concepts allow for the inherent nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge both the fundamentals of the applied Monte Carlo methods as well as the conceptual details in the context of the sputtering scenario are elaborated on. Finally, two in the context of sputtering transport simulations often exploited assumptions, namely on the energy distribution of impinging ions as well as on the test particle approach, are validated for the proposed example discharge.

  4. Characterization of the plasma in a radio-frequency magnetron sputtering system

    International Nuclear Information System (INIS)

    In order to understand the fundamental mechanisms in a radio-frequency magnetron sputtering system, the main properties of the argon plasma used in the process have been measured. A complete three-dimensional map of the ion density, electron temperature, and plasma potential has been obtained using a Langmuir probe. The electron temperature as well as the ion density have been found to increase in the region of the so called race track at the cathode. Furthermore, from the plasma potential map, the time-averaged local electric field has been obtained, pointing out the race track as the region where the most intense ion bombardment takes place. Besides, only the ions produced near the race track are accelerated towards the cathode, whereas those produced in the remaining volume move towards the anode. Finally, the dependence of the plasma quantities on the incident radio-frequency power and deposition pressure has been studied. The plasma potential measured using the Langmuir probe has been found to agree with that determined using an energy resolved mass spectrometer in all studied conditions

  5. Plasma Nitriding of 722M24 Steel with Pure Lanthanum, Cerium and Neodymium as Sputter Sources

    Institute of Scientific and Technical Information of China (English)

    张津; 孙勇

    2001-01-01

    A series of experiments were carried out to investigate the influence of pure rare earth addition on the plasma nitriding response of low alloy steel. For this purpose, pure rare earth metals (La, Ce and Nd) were put into the plasma nitriding furnace as sputter sources during nitriding of 722M24 steel. A variety of experimental and analytical techniques were employed to evaluate the structures and hardening response of the nitrided layers which included metallography for structural examination, glow discharge spectrometry and secondary ion mass spectrometry for chemical composition profile analysis, X-ray diffraction for phase identification and microhardness testing for hardness profile measurements. The results show that the incorporation of rare earth metals in the glow discharge during plasma nitriding not only influences the discharge characteristics but also results in the deposition of rare earth atoms and their compounds onto the specimen surface. These significantly affect the response of the investigated steel to plasma nitriding. The extent of the influence on plasma nitriding varies with different rare earth metals.

  6. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Tverdokhlebov, S.I., E-mail: tverd@tpu.ru [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Bolbasov, E.N.; Shesterikov, E.V. [Tomsk Polytechnic University, 30 Lenin Avenue, Tomsk 634050 (Russian Federation); Antonova, L.V.; Golovkin, A.S.; Matveeva, V.G. [Federal State Budgetary Institution Research Institute for Complex Issues of Cardiovascular Disease, 6 Sosnovy Blvd, Kemerovo 650002 (Russian Federation); Petlin, D.G.; Anissimov, Y.G. [Griffith University, School of Natural Sciences, Engineering Dr., Southport, QLD 4222 (Australia)

    2015-02-28

    Highlights: • The treatment by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering improves the biocompatibility of PLLA surface. • The treatment significantly increases the roughness of PLLA surface. • The formation of rough highly porous surface is due to the etching and crystallization processes on PLLA surface during treatment. • Maximum concentration of the ions from the sputtered target is achieved at 60 s of the plasma treatment. - Abstract: Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  7. β-Ta and α-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas

    International Nuclear Information System (INIS)

    Thin films of β-Ta and α-Cr were deposited on Si(1 0 0) and 1000 Å SiO2/Si(1 0 0), by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dcMS) in hydrogen-containing plasmas. The films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction, scanning electron microscopy, elastic recoil detection analysis, and four-point probe measurements. The results showed that 001-oriented β-Ta films containing up to ∼8 at% hydrogen were obtained with HiPIMS, albeit with no chemical shift evident in XPS. The 110 oriented α-Cr films display a hydrogen content less than the detection limit of 1 at%, but H2 favors the growth of high-purity films for both metals. The β-Ta films deposited with dcMS are columnar, which seems independent of H2 presence in the plasma, while the films grown by HIPIMS are more fine-grained. The latter type of microstructure was present for the α-Cr films and found to be independent on choice of technique or hydrogen in the plasma. The β-Ta films show a resistivity of ∼140–180 µΩ cm, while α-Cr films exhibit values around 30 µΩ cm; the lowest values obtained for films deposited by HiPIMS and with hydrogen in the plasma for both metals.

  8. Interaction of deuterium plasma with sputter-deposited tungsten nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Gao, Liang [Max-Planck-Institut fuer Plasmaphysik, Boltzmannstr. 2, 85748 Garching (Germany); Ruhr-Universitaet, Bochum, Universitaetsstrasse 150, 44801 Bochum (Germany); Jacob, Wolfgang; Schwarz-Selinger, Thomas; Manhard, Armin; Meisl, Gerd [Max-Planck-Institut fuer Plasmaphysik, Boltzmannstr. 2, 85748 Garching (Germany)

    2015-05-01

    N2 seeding is frequently used for radiative power dissipation in fusion devices with full-tungsten divertor, such as ASDEX-Upgrade and JET. N implantation into W or redeposition of W in the presence of N may produce N-containing W surfaces. Magnetron-sputtered tungsten nitride (WN{sub x}) films were exposed to deuterium (D) plasmas to mimic the interaction of D plasmas with such re-deposited layers. RBS and NRA were employed to measure the composition of WN{sub x}, erosion by D plasma and D retention. D implantation was performed with ion energies below 215 eV at sample temperatures of 300 K and 600 K. Low energy Ar plasma exposure was combined with NRA measurements for D depth profiling in the uppermost nanometers. The experimental results are compared with SDTRIM.SP simulations. Results show that D was only retained within the ion penetration range for samples exposed at 300 K. At 600 K, the total amount of retained D decreases by 50% compared with 300 K and D diffuses beyond the implantation zone. Annealing of the WN prior to D implantation can partially heal the D trap-sites thus reducing the retained D in the implantation zone by about 10%.

  9. Comparative study of nanocomposites prepared by pulsed and dc sputtering combined with plasma polymerization suitable for photovoltaic device applications

    Energy Technology Data Exchange (ETDEWEB)

    Hussain, Amreen A. [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Pal, Arup R., E-mail: arpal@iasst.gov.in [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Kar, Rajib [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India); Bailung, Heremba; Chutia, Joyanti [Physical Sciences Division, Institute of Advanced Study in Science and Technology, Guwahati, Assam (India); Patil, Dinkar S. [Laser and Plasma Technology Division, Bhabha Atomic Research Center, Trombay, Mumbai (India)

    2014-12-15

    Plasma processing, a single step method for production of large area composite films, is employed to deposit plasma polymerized aniline-Titanium dioxide (PPani-TiO{sub 2}) nanocomposite thin films. The deposition of PPani-TiO{sub 2} nanocomposite films are made using reactive magnetron sputtering and plasma polymerization combined process. This study focuses on the direct comparison between continuous and pulsed dc magnetron sputtering techniques of titanium in combination with rf plasma polymerization of aniline. The deposited PPani-TiO{sub 2} nanocomposite films are characterized and discussed in terms of structural, morphological and optical properties. A self powered hybrid photodetector has been developed by plasma based process. The proposed method provides a new route where the self-assembly of molecules, that is, the spontaneous association of atomic or molecular building blocks under plasma environment, emerge as a successful strategy to form well-defined structural and morphological units of nanometer dimensions. - Highlights: • PPani-TiO{sub 2} nanocomposite by pulsed and dc sputtering with rf plasma polymerization. • In-situ and Ex-situ H{sub 2}SO{sub 4} doping in PPani-TiO{sub 2} nanocomposite. • PPani-TiO{sub 2} nanocomposite based self-powered-hybrid photodetector.

  10. High damage threshold HfO2/SiO2 multilayer mirrors deposited by novel remote plasma sputtering

    Institute of Scientific and Technical Information of China (English)

    XU Ying; CHEN Nan; BU Yi-kun

    2011-01-01

    Sputtering deposition coatings offer significant advantages on electron beam (EB) deposition,including high packing density,environmental stability and extremely low losses.But the inherent high compressive stress affects its application in high power laser system.This paper describes the technical feasibility of high damage threshold laser mirrors deposited by a novel remote plasma sputtering technique.This technique is based on generating intensive plasma remotely from the target and then magnetically steering the plasma to the target to realize the full uniform sputtering.The pseudo-independence between target voltage and target current provides us very flexible parameters tuning,especially for the films stress control.Deposition conditions are optimized to yield fully oxidized and low compressive stress single layer HfO2 and SiO2.The high damage threshold of 43.8 J/cm2 for HfO2/SiO2 laser mirrors at 1064 nm is obtained.For the first time the remote plasma sputtering is successfully applied in depositing laser mirrors with high performance.

  11. Parameter Study of Plasma-Induced Atmospheric Sputtering and Heating at Mars

    Science.gov (United States)

    Williamson, Hayley N.; Johnson, Robert E.; Leblanc, Francois

    2014-11-01

    Atoms and molecules in Mars’ upper atmosphere are lost predominately through sputtering, caused by the impact of ions into the exosphere, dissociative recombination, and thermal escape. While all three processes are thought to occur on Mars, a detailed understanding must ascertain the relative importance of each process, due to time variations in pick-up and solar wind ions. In this project, using case studies of an oxygen atmosphere modeled with Direct Simulation Monte Carlo techniques, we have endeavored to categorize when the momentum transfer or thermal escape is more likely to occur. To do this, we vary the incident plasma flux and energy based on models of the interaction of the solar wind with the Martian atmosphere. We first repeat the heating and sputtering rates due to a flux of pick-up O+ examined previously (Johnson et al. 2000; Michael and Johnson 2005; Johnson et al 2013). We have used multiple examples of particle fluxes for various solar wind conditions, from steady solar wind conditions (Luhmann et al. 1992; Chaufray et al. 2007) to more extreme cases (Fang et al. 2013; Wang et al. 2014), which are thought to increase escape by several orders of magnitude. The goal is to explore the escape parameter space in preparation for the expected data from MAVEN on hot atoms and molecules in the Martian exosphere.

  12. Modification of polylactic acid surface using RF plasma discharge with sputter deposition of a hydroxyapatite target for increased biocompatibility

    Science.gov (United States)

    Tverdokhlebov, S. I.; Bolbasov, E. N.; Shesterikov, E. V.; Antonova, L. V.; Golovkin, A. S.; Matveeva, V. G.; Petlin, D. G.; Anissimov, Y. G.

    2015-02-01

    Surface modification of polylactic acid (PLLA) by plasma of radio-frequency magnetron discharge with hydroxyapatite target sputtering was investigated. Increased biocompatibility was demonstrated using studies with bone marrow multipotent mesenchymal stromal cells. Atomic force microscopy demonstrates that the plasma treatment modifies the surface morphology of PLLA to produce rougher surface. Infrared spectroscopy and X-ray diffraction revealed that changes in the surface morphology are caused by the processes of PLLA crystallization. Fluorescent X-ray spectroscopy showed that the plasma treatment also changes the chemical composition of PLLA, enriching it with ions of the sputtered target: calcium, phosphorus and oxygen. It is hypothesized that these surface modifications increase biocompatibility of PLLA without increasing toxicity.

  13. Bright X-ray source from a laser-driven micro-plasma-waveguide

    CERN Document Server

    Yi, Longqing

    2016-01-01

    Bright tunable x-ray sources have a number of applications in basic science, medicine and industry. The most powerful sources are synchrotrons, where relativistic electrons are circling in giant storage rings. In parallel, compact laser-plasma x-ray sources are being developed. Owing to the rapid progress in laser technology, very high-contrast femtosecond laser pulses of relativistic intensities become available. These pulses allow for interaction with micro-structured solid-density plasma without destroying the structure by parasitic pre-pulses. The high-contrast laser pulses as well as the manufacturing of materials at micro- and nano-scales open a new realm of possibilities for laser interaction with photonic materials at the relativistic intensities. Here we demonstrate, via numerical simulations, that when coupling with a readily available 1.8 Joule laser, a micro-plasma-waveguide (MPW) may serve as a novel compact x-ray source. Electrons are extracted from the walls by the laser field and form a dense ...

  14. Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

    CERN Document Server

    Corbella, Carles; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP).

  15. High brightness EUV sources based on laser plasma at using droplet liquid metal target

    Science.gov (United States)

    Vinokhodov, A. Yu; Krivokorytov, M. S.; Sidelnikov, Yu V.; Krivtsun, V. M.; Medvedev, V. V.; Koshelev, K. N.

    2016-05-01

    We present the study of a source of extreme ultraviolet (EUV) radiation based on laser plasma generated due to the interaction of radiation from a nanosecond Nd : YAG laser with a liquidmetal droplet target consisting of a low-temperature eutectic indium–tin alloy. The generator of droplets is constructed using a commercial nozzle and operates on the principle of forced capillary jet decomposition. Long-term spatial stability of the centre-of-mass position of the droplet with the root-mean-square deviation of ~0.5 μm is demonstrated. The use of a low-temperature working substance instead of pure tin increases the reliability and lifetime of the droplet generator. For the time- and space-averaged power density of laser radiation on the droplet target 4 × 1011 W cm-2 and the diameter of radiating plasma ~80 μm, the mean efficiency of conversion of laser energy into the energy of EUV radiation at 13.5 +/- 0.135 nm equal to 2.3% (2π sr)-1 is achieved. Using the doublepulse method, we have modelled the repetitively pulsed regime of the source operation and demonstrated the possibility of its stable functioning with the repetition rate up to 8 kHz for the droplet generation repetition rate of more than 32 kHz, which will allow the source brightness to be as large as ~0.96 kW (mm2 sr)-1.

  16. Enhancement of the crystalline Ge film growth by inductively coupled plasma-assisted pulsed DC sputtering.

    Science.gov (United States)

    Kim, Eunkyeom; Han, Seung-Hee

    2014-11-01

    The effect of pulsed DC sputtering on the crystalline growth of Ge thin film was investigated. Ge thin films were deposited on the glass substrates using ICP-assisted pulsed DC sputtering. The Ge target was sputtered using asymmetric bipolar pulsed DC sputtering system with and without assistance of ICP source. The pulse frequency of 200 Hz and the pulse on time of 500 μsec (duty cycle = 10%) were kept during sputtering process. Crystal structures were studied from X-ray diffraction. The X-ray diffraction patterns clearly showed crystalline film structures. The Ge thin films with randomly oriented crystalline were obtained using pulsed DC sputtering without ICP, whereas they had well aligned (220) orientation crystalline using ICP source. Moreover, the combination of ICP assistance and pulsed DC sputtering enhanced the growth of crystalline Ge thin films without hydrogen and metal by in situ deposition. The structure and lattice of the films were studied from TEM images. The cross-sectional TEM images revealed the deposited Ge films with columnar structure.

  17. The mechanism of controlling liquid crystal surface pretilt angle on plasma beam sputtered films

    Science.gov (United States)

    Pan, Ru-Pin; Huang, Meng-Chiou; Wu, Wei-Ta; Lai, Cheng-Wei; Wu, Hsin-Ying

    2012-02-01

    In liquid crystal (LC) devices, the surface alignment is essential. The polyimide (PI) film is commonly used to make LC molecules parallel to the surface. A rubbing process is usually applied to choose a particular direction on the surface. A pretilt angle is also induced, which is useful but usually very small. In previous works, we have found out that the sputtered ion-oxide films can give a homeotropic alignment to LC, i,e, the LC molecules are perpendicular to the surface. In this work, we combine these two effects by sputtering the ion-oxide particles onto the PI coated glasses. By adjusting the sputtering conditions, the LC alignment are controlled. A wide range of pretilt angles have been achieved, while the rubbing process is no longer required. A thorough study by varying the sputtering conditions, such as voltage, current, and time duration, and observing the pretilt angles is carried out. The sputtered surfaces are examined with scanning electron microscope to see the coverage. By considering the charge distribution and electric field within the sputter, a quantitative model is then developed, which explains how the sputtering conditions affect the pretilt angles almost perfectly.

  18. Sputtering yields and surface chemical modification of tin-doped indium oxide in hydrocarbon-based plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi, E-mail: hamaguch@ppl.eng.osaka-u.ac.jp [Center for Atomic and Molecular Technologies, Osaka University, Yamadaoka 2-1, Suita 565-0871 (Japan); Fukasawa, Masanaga; Nagahata, Kazunori; Tatsumi, Tetsuya [Device and Material R& D Group, RDS Platform, Sony Corporation, Kanagawa 243-0014 (Japan)

    2015-11-15

    Sputtering yields and surface chemical compositions of tin-doped indium oxide (or indium tin oxide, ITO) by CH{sup +}, CH{sub 3}{sup +}, and inert-gas ion (He{sup +}, Ne{sup +}, and Ar{sup +}) incidence have been obtained experimentally with the use of a mass-selected ion beam system and in-situ x-ray photoelectron spectroscopy. It has been found that etching of ITO is chemically enhanced by energetic incidence of hydrocarbon (CH{sub x}{sup +}) ions. At high incident energy incidence, it appears that carbon of incident ions predominantly reduce indium (In) of ITO and the ITO sputtering yields by CH{sup +} and CH{sub 3}{sup +} ions are found to be essentially equal. At lower incident energy (less than 500 eV or so), however, a hydrogen effect on ITO reduction is more pronounced and the ITO surface is more reduced by CH{sub 3}{sup +} ions than CH{sup +} ions. Although the surface is covered more with metallic In by low-energy incident CH{sub 3}{sup +} ions than CH{sup +} ions and metallic In is in general less resistant against physical sputtering than its oxide, the ITO sputtering yield by incident CH{sub 3}{sup +} ions is found to be lower than that by incident CH{sup +} ions in this energy range. A postulation to account for the relation between the observed sputtering yield and reduction of the ITO surface is also presented. The results presented here offer a better understanding of elementary surface reactions observed in reactive ion etching processes of ITO by hydrocarbon plasmas.

  19. Effect of nitrogen-containing plasma on adherence, friction, and wear of radiofrequency-sputtered titanium carbide coatings

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440C steel surfaces that were rf sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. Both X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that the small partial pressure of nitrogen (approximately 0.5 percent) markedly improves the adherence, friction, and wear properties when compared with coatings applied to sputter-etched surfaces, oxidized surfaces, or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  20. Use of a nitrogen-argon plasma to improve adherence of sputtered titanium carbide coatings on steel

    Science.gov (United States)

    Brainard, W. A.; Wheeler, D. R.

    1979-01-01

    Friction and wear experiments on 440-C steel surfaces that had been RF-sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that a small partial pressure of nitrogen (about 0.5%) markedly improves the adherence, friction, and wear properties when compared with coatings applied on sputter-etched oxidized surfaces or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

  1. Adhesion of NiCu Films DC Biased Plasma-Sputter-Deposited on MgO (001)

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    NiCu films about 60nm thick were deposited on MgO (001) substrates at 230℃ by DC plasma-sputtering at 2.7kV and 8mA in pure Ar gas using a Ni90Cu10 target. A DC bias voltage of 0, 60, 110 or 140V was applied to the substrate during deposition. The adhesion of the film to the substrate was studied using a scratch test as a function of . The application of is very effective in increasing the adhesion of the film to the substrate. In conclusion, the adhesion increases with cleaning the substrate surface by sputtering off impurity admolecules during the film initial formation due to the energetic Ar ion particle bombardment.

  2. Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2008-01-01

    Full Text Available We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λex=514.5 nm, lex=488 nm and also using a semiconductor laser (λex=980 nm. Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

  3. The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures

    Science.gov (United States)

    Brown, H. L.; Thornley, S. A.; Wakeham, S. J.; Thwaites, M. J.; Curry, R. J.; Baker, M. A.

    2015-08-01

    With the progression towards higher aspect ratios and finer topographical dimensions in many micro- and nano-systems, it is of technological importance to be able to conformally deposit thin films onto such structures. Sputtering techniques have been developed to provide such conformal coverage through a combination of coating re-sputtering and ionised physical vapour deposition (IPVD), the latter by use of a secondary plasma source or a pulsed high target power (HiPIMS). This paper reports on the use of an alternate remote plasma sputtering technique in which a high density (>1013 cm-3) magnetised plasma is used for sputter deposition, and additionally is shown to provide IPVD and a re-sputtering capability. From the substrate I-V characteristics and optical emission spectroscopy (OES) data, it is shown that remote plasma sputtering is an inherently continuous IPVD process (without the need of a secondary discharge). Through the reactive deposition of Al2O3 onto complex structures, scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDX) results demonstrate that applying a negative substrate bias during film growth can result in re-sputtering of deposited material and film growth on surfaces obscured from the initial sputter flux. Using 5 : 1 (height : width) aspect ratio trenches, the substrate bias was set to 0,-245 and  -334 V. At 0 V substrate bias, the alumina coating is predominantly deposited on the horizontal surfaces; at  -344 V, it is predominantly deposited onto the side walls and at  -245 V a more uniform layer thickness is obtained over the trench. The process was optimised further by alternating the substrate bias between  -222 and  -267 V, with a 50% residence time at each voltage, yielding a more uniform conformal coverage of the 5 : 1 aspect ratio structures over large areas.

  4. Effect of O2 gas partial pressure on mechanical properties of Al2O3 films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering

    International Nuclear Information System (INIS)

    The effect of O2 partial pressure on the mechanical properties of Al2O3 films is studied. Using films prepared by inductively coupled plasma-assisted radio frequency magnetron sputtering, the deposition rate of Al2O3 decreases rapidly when oxygen is added to the argon sputtering gas. The internal stresses in the films are compressive, with magnitude decreasing steeply from 1.6 GPa for films sputtered in pure argon gas to 0.5 GPa for films sputtered in argon gas at an O2 partial pressure of 0.89 × 10−2 Pa. Stress increases gradually with increasing O2 partial pressure. Using a nanoindentation tester with a Berkovich indenter, film hardness was measured to be about 14 GPa for films sputtered in pure argon gas. Hardness decreases rapidly on the addition of O2 gas, but increases when the O2 partial pressure is increased. Adhesion, measured using a Vickers microhardness tester, increases with increasing O2 partial pressure. Electron probe microanalyzer measurements reveal that the argon content of films decreases with increasing O2 partial pressure, whereas the O to Al composition ratio increases from 1.15 for films sputtered in pure argon gas to 1.5 for films sputtered in argon gas at O2 partial pressures over 2.4 × 10−2 Pa. X-ray diffraction measurements reveal that films sputtered in pure argon gas have an amorphous crystal structure, whereas γ-Al2O3 is produced for films sputtered in argon gas with added O2 gas. Atomic force microscopy observations reveal that the surface topography of sputtered Al2O3 films changes from spherical to needlelike as O2 partial pressure is increased. Fracture cross sections of the films observed by scanning electron microscopy reveal that the film morphology exhibits no discernible features at all O2 partial pressures.

  5. Plasma-Neutral Coupling on the Dark and Bright Sides of Antarctica

    Science.gov (United States)

    Chu, X.; Yu, Z.; Fong, W.; Chen, C.; Zhao, J.; Huang, W.; Roberts, B. R.; Fuller-Rowell, T. J.; Richmond, A. D.; Gerrard, A. J.; Weatherwax, A. T.; Gardner, C. S.

    2014-12-01

    The polar mesosphere and thermosphere provide a unique natural laboratory for studying the complex physical, chemical, neutral dynamical and electrodynamics processes in the Earth's atmosphere and space environment. McMurdo (geographic 77.83S, geomagnetic 80S) is located by the poleward edge of the aurora oval; so energetic particles may penetrate into the lower thermosphere and mesosphere along nearly vertical geomagnetic field lines. Lidar observations at McMurdo from December 2010 to 2014 have discovered several neutral atmosphere phenomena closely related to ionosphereic parameters and geomagnetic activity. For example, the diurnal tidal amplitude of temperatures not only increases super-exponentially from 100 to 110 km but also its growth rate becomes larger at larger Kp index. The lidar discovery of neutral iron (Fe) layers with gravity wave signatures in the thermosphere enabled the direct measurements of neutral temperatures from 30 to 170 km, revealing the neutral-ion coupling and aurora-enhanced Joule heating. A lidar 'marathon' of 174-hour continuous observations showed dramatic changes of composition (Fe atoms and ice particles) densities (over 40 times) in the mesopause region and their correlations to solar events. In this paper we will study the plasma-neutral coupling on the dark side of Antarctica via observation analysis and numerical modeling of the thermospheric Fe layers in the 100-200 km. A newly developed thermospheric Fe/Fe+ model is used to quantify how Fe+ ions are transported from their main deposition region to the E-F region and then neutralized to form Fe layers under dark polar conditions. We will also study the plasma-neutral coupling on the bright side of Antarctica via analyzing Fe events in summer. Complementary observations will be combined to show how the extreme changes of Fe layers are related to aurora particle precipitation and visible/sub-visible ice particles. These observations and studies will open new areas of

  6. Preparation of Ag-containing diamond-like carbon films on the interior surface of tubes by a combined method of plasma source ion implantation and DC sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Hatada, R., E-mail: hatada@ca.tu-darmstadt.de [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Flege, S.; Bobrich, A.; Ensinger, W.; Dietz, C. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Baba, K. [Industrial Technology Center of Nagasaki, Applied Technology Division, Omura, Nagasaki 856-0026 (Japan); Sawase, T.; Watamoto, T. [Nagasaki University, Department of Applied Prosthodontics, Nagasaki 852-8523 (Japan); Matsutani, T. [Technische Universität Darmstadt, Department of Materials Science, 64287 Darmstadt (Germany); Kinki University, Department of Electric and Electronic Engineering, Higashi-osaka 577-2332 (Japan)

    2014-08-15

    Highlights: • Deposition of Ag-containing diamond-like carbon films inside of tubes. • Combination of plasma source ion implantation and DC sputtering. • Antibacterial effect against S. aureus bacteria. - Abstract: Adhesive diamond-like carbon (DLC) films can be prepared by plasma source ion implantation (PSII), which is also suitable for the treatment of the inner surface of a tube. Incorporation of a metal into the DLC film provides a possibility to change the characteristics of the DLC film. One source for the metal is DC sputtering. In this study PSII and DC sputtering were combined to prepare DLC films containing low concentrations of Ag on the interior surfaces of stainless steel tubes. A DLC film was deposited using a C{sub 2}H{sub 4} plasma with the help of an auxiliary electrode inside of the tube. This electrode was then used as a target for the DC sputtering. A mixture of the gases Ar and C{sub 2}H{sub 4} was used to sputter the silver. By changing the gas flow ratios and process time, the resulting Ag content of the films could be varied. Sample characterizations were performed by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, atomic force microscopy and Raman spectroscopy. Additionally, a ball-on-disk test was performed to investigate the tribological properties of the films. The antibacterial activity was determined using Staphylococcus aureus bacteria.

  7. Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma

    International Nuclear Information System (INIS)

    The selective deposition of Si films was demonstrated using a chemical sputtering process induced by a high pressure hydrogen plasma at 52.6 kPa (400 Torr). In this chemical sputtering process, the initial deposition rate (Rd) is dependent upon the substrate type. At the initial stage of Si film formation, Rd on glass substrates increased with elapsed time and reached to a constant value. In contrast, Rd on Si substrates remained constant during the deposition. The selective deposition of Si films can be achieved by adjusting the substrate temperature (Tsub) and hydrogen concentration (CH2) in the process atmosphere. For any given deposition time, it was found that an optimum CH2 exists for a given Tsub to realize the selective deposition of a Si film, and the optimum Tsub value tends to increase with decreasing CH2. According to electron diffraction patterns obtained from the samples, the selectively prepared Si films showed epitaxial-like growth, although the Si films contained many defects. It was revealed by Raman scattering spectroscopy that some of the defects in the Si films were platelet defects induced by excess hydrogen incorporated during Si film formation. Raman spectrum also suggested that Si related radicals (SiH2, SiH, Si) with high reactivity contribute to the Si film formation. Simple model was derived as the guideline for achieving the selective growth

  8. Microstructure and Mechanical Properties of CrN Films Deposited by Inductively Coupled Plasma Enhanced Radio Frequency Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    LIU Feng; MENG Yuedong; REN Zhaoxing; SHU Xingsheng

    2008-01-01

    CrN films have been synthesized on Si(100) wafer by inductively coupled plasma (ICP)-enhanced radio frequency (RF) magnetron sputtering. The effects of ICP power on mi-crostructure, crystal orientation, nanohardness and stress of the CrN films have been investigated. With the increase of ICP power, the current density at substrate increases and the films exhibit denser structure, while the DC self-bias of target and the deposition rate of films decrease. The films change from crystal structure to amorphous structure with the increase of ICP power. The measured nanohardness and the compressive stress of films reach the topmost at ICP power of 150 W and 200 W, respectively. The mechanical properties of films show strong dependence on the crystalline structure and the density influenced by the ICP power.

  9. The Structure and Properties of Inductively Coupled Plasma Assisted Magnetron Sputtered Nanocrystalline NbN Coatings in Corrosion Protective Die Casting Molds.

    Science.gov (United States)

    Chun, Sung-Yong

    2016-02-01

    Niobium nitride coatings for the surface modified die casting molds with various ICP powers have been prepared using ICP assisted magnetron sputtering. The applied ICP power was varied from 0 to 200 W. The deposited coatings were characterized post-deposition using X-ray diffractometry (XRD) and atomic force microscopy (AFM). Single NbN phased coatings with nano-grain sized (hardness of each coating were evaluated from potentiostat and nanoindentator. Superior corrosion protective coatings in excess of 13.9 GPa were deposited with assistance of ICP plasma during sputtering.

  10. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    Energy Technology Data Exchange (ETDEWEB)

    Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

    2015-07-28

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

  11. Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

    International Nuclear Information System (INIS)

    Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation

  12. Plasma deposition of piezoelectric ZnO layers by rf sputtering, SolGel and pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Waetje, Kerstin; Ebbecke, Jens; Wixforth, A. [Institut fuer Physik der Universitaet Augsburg, Experimentalphysik I, Universitaetsstrasse 1, 86135 Augsburg (Germany); Thorwarth, Goetz; Ven, Mark van de [Institut fuer Physik der Universitaet Augsburg, Experimentalphysik IV, Universitaetsstrasse 1, 86135 Augsburg (Germany)

    2008-07-01

    As ''lab-on-a-chip-devices'' suited for analyses of least amounts of liquids are emerging from prototype status, cost-effective materials for mass production of these devices are sought. For handling and mixing components, surface acoustic waves generated by piezoelectric elements are routinely employed; however, the LiNbO{sub 3} single crystals used in such units are a significant cost factor. As an alternative, zinc oxide layers deposited onto the glass substrates hold the promise of cheaper production and easier integration into the assembly. In the present study, experiments regarding the deposition of such layers using different plasma processes are presented. Film synthesis was performed using rf magnetron sputtering, pulsed laser deposition and plasma based ion bombardment of Sol-Gel films on crystalline and amorphous substrates. The impacts of significant deposition parameters are discussed. At optimum deposition parameters, excellent columnar growth in the preferred c-axis orientation could be observed. The suitability of such films for the desired application is substanciated through first mixing experiments using optically lithographed interdigital transducers (IDTs). (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery.

    Science.gov (United States)

    Akazawa, Housei

    2016-06-01

    The branched-waveguide electron cyclotron resonance plasma sputtering apparatus places quartz windows for transmitting microwaves into the plasma source not in the line of sight of the target. However, the quartz windows must be replaced after some time of operation. For maintenance, the loop waveguide branching from the T-junction must be dismounted and re-assembled accurately, which is a time-consuming job. We investigated substituting the waveguide branches with two sets of coaxial cables and waveguide/coaxial cable converters to simplify assembly as far as connection and disconnection go. The resulting hybrid system worked well for the purposes of plasma generation and film deposition.

  14. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery

    Science.gov (United States)

    Akazawa, Housei

    2016-06-01

    The branched-waveguide electron cyclotron resonance plasma sputtering apparatus places quartz windows for transmitting microwaves into the plasma source not in the line of sight of the target. However, the quartz windows must be replaced after some time of operation. For maintenance, the loop waveguide branching from the T-junction must be dismounted and re-assembled accurately, which is a time-consuming job. We investigated substituting the waveguide branches with two sets of coaxial cables and waveguide/coaxial cable converters to simplify assembly as far as connection and disconnection go. The resulting hybrid system worked well for the purposes of plasma generation and film deposition.

  15. Ratio of Cu, Zn, Sn and S densities in magnetron sputtering plasmas employing a stoichiometric Cu2ZnSnS4 target

    Science.gov (United States)

    Nafarizal, Nayan; Sasaki, Koichi

    2015-09-01

    Recently, Cu2ZnSnS4 (CZTS) has drawn wide attention as a highly potential material for the next-generation thin film solar cells. In order to optimize CZTS thin films for solar cells, it is essential to understand their deposition mechanism. Especially since it consists of four elements, it is difficult to control the stoichiometric properties. In the present work, we measured the absolute ground-state densities of Cu, Zn, Sn, and S atoms released from a stoichiometric CZTS target in magnetron sputtering plasmas. The absolute atom densities were evaluated by ultraviolet and vacuum ultraviolet absorption spectroscopy. Magnetron sputtering plasmas were produced using a pulsed-modulated rf power supply and the temporal variations of atom densities were measured in the afterglow. The absolute Cu, Zn, Sn and S densities in the discharge phase were evaluated by the extrapolations of the temporal variations. It has been observed that the absolute Cu, Zn, Sn and S densities in the gas phase were not in agreement with the stoichiometry of the target as well as that of the deposited film. The results suggest possibilities of unconventional sputtering and deposition processes in the compound sputter deposition.

  16. Magnetron Plasma Sputtered Nanocomposite Thin Films: Structural Surface Studies by In Vacuo Photoelectron Spectroscopy

    International Nuclear Information System (INIS)

    The experimental system that enables thin film deposition by chemical vapor deposition combined with magnetron sputtering and sample surface characterization by photoelectron spectroscopy (PES), without breaking the vacuum between the deposition and the characterization stage, is described. The particular goal of this work was study of the surface arrangement of embedded metallic nanoclusters of 1B group (Au, Ag, and Cu) in amorphous hydrogenated carbon (a-C:H). From the range of applied material characterization tools, we present here the results of several PES-based experiments used to reveal cluster properties at the surface: as-deposited sample PES measurements, off-normal take-off angle XPS, and in situ in-depth XPS profiling by Ar+ ion etching. Clear distinction in all PES results of the samples deposited on the grounded substrates from those deposited on -150 V dc biased ones is obtained, revealing that keeping the substrate grounded during deposition results in topmost metallic clusters covered with a very thin layer of a-C:H, while applying negative bias voltage to the substrate results in partially bald clusters on the surface

  17. A combined sensor for the diagnostics of plasma and film properties in magnetron sputtering processes

    International Nuclear Information System (INIS)

    A combined sensor for the simultaneous measurement of plasma and deposition parameters has been designed and built. It comprises (i) a quartz crystal microbalance, (ii) a planar Langmuir probe and (iii) a calorimetric (Gardon) probe, which allows to measure the deposition rate, typical plasma parameters (plasma density and electron temperature) and the total energy input into a growing film. The combined sensor is electrically insulated against ground, allowing these measurements also for floating or substrate-bias conditions. These parameters are measured (nearly) simultaneously, controlled by a specific measurement and analysis program. The operation of this combined sensor is demonstrated for the deposition of copper and tungsten films with a 2 inch planar magnetron. - Highlights: ►A combined sensor was developed for the analysis of plasma and deposition parameters. ►It consists of a quartz crystal microbalance, a Langmuir and a calorimetric probe. ►It allows to measure the deposition rate, plasma density and the total energy input. ►It allows a fast analysis of particle and energy fluxes on a growing film.

  18. Process controllability of inductively coupled plasma-enhanced reactive sputter deposition for the fabrication of amorphous InGaZnOx channel thin-film transistors

    Science.gov (United States)

    Takenaka, Kosuke; Nakata, Keitaro; Otani, Hirofumi; Osaki, Soichiro; Uchida, Giichiro; Setsuhara, Yuichi

    2016-01-01

    The process controllability of inductively coupled plasma-enhanced reactive sputter deposition for the fabrication of amorphous InGaZnOx (a-IGZO) channel thin-film transistors (TFTs) was investigated. a-IGZO film deposition with the addition of H2 gas was performed using a plasma-assisted reactive sputtering system to control the oxidation process during a-IGZO film formation by balancing the oxidation and reduction reactions. Optical emission spectroscopy measurements indicate the possibility for the oxidation reaction to be inhibited by a decrease in the density of oxygen atoms and the reduction effect of hydrogen during a-IGZO film deposition due to the addition of H2 gas. The characteristics of TFTs fabricated using a-IGZO films deposited with a plasma-enhanced magnetron sputtering deposition system were investigated. The results indicate the possibility of expanding the process window by controlling the balance between oxidation and reduction with the addition of H2 gas. TFTs with a-IGZO films that were deposited with the addition of H2 gas exhibited good performance with a field-effect mobility (μFE) of 15.3 cm2 V-1 s-1 and a subthreshold gate voltage swing (S) of 0.48 V decade-1.

  19. Very deep spectroscopy of the bright Saturn Nebula NGC 7009 -- I. Observations and plasma diagnostics

    CERN Document Server

    Fang, X

    2011-01-01

    We present very deep CCD spectrum of the bright, medium-excitation planetary nebula NGC 7009, with a wavelength coverage from 3040 to 11000 A. Traditional emission line identification is carried out to identify all the emission features in the spectra, based on the available laboratory atomic transition data. Since the spectra are of medium resolution, we use multi-Gaussian line profile fitting to deblend faint blended lines, most of which are optical recombination lines (ORLs) emitted by singly ionized ions of abundant second-row elements such as C, N, O and Ne. Computer-aided emission-line identification, using the code EMILI developed by Sharpee et al., is then employed to further identify all the emission lines thus obtained. In total about 1200 emission features are identified, with the faintest ones down to fluxes 10^{-4} of H_beta. The flux errors for all emission lines, estimated from multi-Gaussian fitting, are presented. Plots of the whole optical spectrum, identified emission lines labeled, are pre...

  20. The use of segmented cathodes to determine the spoke current density distribution in high power impulse magnetron sputtering plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Poolcharuansin, Phitsanu [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ (United Kingdom); The Technological Plasma Research Unit, Department of Physics, Mahasarakham University, Maha Sarakham 44150 (Thailand); Estrin, Francis Lockwood; Bradley, James W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ (United Kingdom)

    2015-04-28

    The localized target current density associated with quasi-periodic ionization zones (spokes) has been measured in a high power impulse magnetron sputtering (HiPIMS) discharge using an array of azimuthally separated and electrical isolated probes incorporated into a circular aluminum target. For a particular range of operating conditions (pulse energies up to 2.2 J and argon pressures from 0.2 to 1.9 Pa), strong oscillations in the probe current density are seen with amplitudes up to 52% above a base value. These perturbations, identified as spokes, travel around the discharge above the target in the E×B direction. Using phase information from the angularly separated probes, the spoke drift speeds, angular frequencies, and mode number have been determined. Generally, at low HiPIMS pulse energies E{sub p} < 0.8 J, spokes appear to be chaotic in nature (with random arrival times), however as E{sub p} increases, coherent spokes are observed with velocities between 6.5 and 10 km s{sup −1} and mode numbers m = 3 or above. At E{sub p} > 1.8 J, the plasma becomes spoke-free. The boundaries between chaotic, coherent, and no-spoke regions are weakly dependent on pressure. During each HiPIMS pulse, the spoke velocities increase by about 50%. Such an observation is explained by considering spoke velocities to be determined by the critical ionization velocity, which changes as the plasma composition changes during the pulse. From the shape of individual current density oscillations, it appears that the leading edge of the spoke is associated with a slow increase in local current density to the target and the rear with a more rapid decrease. The measurements show that the discharge current density associated with individual spokes is broadly spread over a wide region of the target.

  1. The use of segmented cathodes to determine the spoke current density distribution in high power impulse magnetron sputtering plasmas

    International Nuclear Information System (INIS)

    The localized target current density associated with quasi-periodic ionization zones (spokes) has been measured in a high power impulse magnetron sputtering (HiPIMS) discharge using an array of azimuthally separated and electrical isolated probes incorporated into a circular aluminum target. For a particular range of operating conditions (pulse energies up to 2.2 J and argon pressures from 0.2 to 1.9 Pa), strong oscillations in the probe current density are seen with amplitudes up to 52% above a base value. These perturbations, identified as spokes, travel around the discharge above the target in the E×B direction. Using phase information from the angularly separated probes, the spoke drift speeds, angular frequencies, and mode number have been determined. Generally, at low HiPIMS pulse energies Ep < 0.8 J, spokes appear to be chaotic in nature (with random arrival times), however as Ep increases, coherent spokes are observed with velocities between 6.5 and 10 km s−1 and mode numbers m = 3 or above. At Ep > 1.8 J, the plasma becomes spoke-free. The boundaries between chaotic, coherent, and no-spoke regions are weakly dependent on pressure. During each HiPIMS pulse, the spoke velocities increase by about 50%. Such an observation is explained by considering spoke velocities to be determined by the critical ionization velocity, which changes as the plasma composition changes during the pulse. From the shape of individual current density oscillations, it appears that the leading edge of the spoke is associated with a slow increase in local current density to the target and the rear with a more rapid decrease. The measurements show that the discharge current density associated with individual spokes is broadly spread over a wide region of the target

  2. Bright and photostable push-pull pyrene dye visualizes lipid order variation between plasma and intracellular membranes

    Science.gov (United States)

    Niko, Yosuke; Didier, Pascal; Mely, Yves; Konishi, Gen-Ichi; Klymchenko, Andrey S.

    2016-01-01

    Imaging lipid organization in cell membranes requires advanced fluorescent probes. Here, we show that a recently synthesized push-pull pyrene (PA), similarly to popular probe Laurdan, changes the emission maximum as a function of lipid order, but outperforms it by spectroscopic properties. In addition to red-shifted absorption compatible with common 405 nm diode laser, PA shows higher brightness and much higher photostability than Laurdan in apolar membrane environments. Moreover, PA is compatible with two-photon excitation at wavelengths >800 nm, which was successfully used for ratiometric imaging of coexisting liquid ordered and disordered phases in giant unilamellar vesicles. Fluorescence confocal microscopy in Hela cells revealed that PA efficiently stains the plasma membrane and the intracellular membranes at >20-fold lower concentrations, as compared to Laurdan. Finally, ratiometric imaging using PA reveals variation of lipid order within different cellular compartments: plasma membranes are close to liquid ordered phase of model membranes composed of sphingomyelin and cholesterol, while intracellular membranes are much less ordered, matching well membranes composed of unsaturated phospholipids without cholesterol. These differences in the lipid order were confirmed by fluorescence lifetime imaging (FLIM) at the blue edge of PA emission band. PA probe constitutes thus a new powerful tool for biomembrane research.

  3. Electrochromic performance of NiVxOy thin films deposited onto flexible PET/ITO substrates by reactive plasma sputtering for flexible electrochromic devices

    International Nuclear Information System (INIS)

    An investigation was conducted on the electrochromic properties of plasma sputtered-nickel-vanadium oxide thin films on 40 Ω/□ flexible polyethylene terephthalate/indium tin oxide substrates. Metallic Ni0.93V0.07 target, sputtered by radio frequency power with argon gases and reacted with oxygen gases at room temperature (23 oC), was proven to provide extraordinary electrochromic performance. Cyclic voltammetry switching measurements found that only low driving voltages from - 1 V to 1 V were needed to provide reversible Li+ ion intercalation and deintercalation. The light modulation with up to 52% of transmittance variation, optical density change of 0.446 and color efficiency of 63.8 cm2/C at a wavelength of 550 nm was obtained for 200 cycles of Li+ intercalation and deintercalation in a 1 M LiClO4-propylene carbonate electrolyte.

  4. Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

    Energy Technology Data Exchange (ETDEWEB)

    Rashid, Nur Maisarah Abdul, E-mail: nurmaisarahrashid@gmail.com [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Muhamad, Muhamad Rasat [Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Rahman, Saadah Abdul, E-mail: saadah@um.edu.my [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2013-02-01

    Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carbon films with the added advantage of eliminating the use of highly toxic silane gas in the deposition process. Silicon (Si) atoms were sputtered from a pure amorphous silicon (a-Si) target by argon (Ar) ions and carbon (C) atoms were incorporated into the film from C based growth radicals generated through the discharge of methane (CH{sub 4}) gas. The effects of r.f. powers of 60, 80, 100, 120 and 150 W applied during the deposition process on the structural and optical properties of the films were investigated. Raman spectroscopic studies showed that the silicon carbon films contain amorphous silicon carbide (SiC) and amorphous carbon (a-C) phases. The r.f. power showed significant influence on the C incorporation in the film structure. The a-C phases became more ordered in films with high C incorporation in the film structure. These films also produced high photoluminescence emission intensity at around 600 nm wavelength as a result of quantum confinement effects from the presence of sp{sup 2} C clusters embedded in the a-SiC and a-C phases in the films. - Highlights: ► Effects of radio frequency (r.f.) power on silicon carbon (SiC) films were studied. ► Hybrid plasma enhanced chemical vapor deposition/sputtering technique was used. ► r.f. power influences C incorporation in the film structure. ► High C incorporation results in higher ordering of the amorphous C phase. ► These films produced high photoluminescence emission intensity.

  5. In situ UV-vis investigation of growth of gold nanoparticles prepared by solution plasma sputtering in NaCl solution

    Science.gov (United States)

    Mizutani, Tsuyoshi; Ogawa, Satoshi; Murai, Takaaki; Nameki, Hirofumi; Yoshida, Tomoko; Yagi, Shinya

    2015-11-01

    Gold nanoparticles are prepared in various concentrations of NaCl solutions by solution plasma sputtering. The absorption spectra of these solutions during and after the plasma process are measured by in situ ultraviolet-visible (UV-vis) spectroscopy to estimate the particle diameters and concentrations of gold. The distributions of particle diameters are obtained by transmission electron microscope (TEM) observations. These experiments indicate the gold nanoparticles with about 2.2 nm are directly formed by plasma phase and the diameters are increasing over time. These increases of particle diameters are caused by Ostwald ripening of gold nanoparticles in NaCl solution. We estimate the equilibrium diameter at which the gold nanoparticles are not solved in NaCl solution using in situ UV-vis spectroscopy. These diameters are about 5, 7 and 10 nm in 3, 5 and 10 mM NaCl solution, respectively. We make it possible to control the diameter of gold nanoparticles prepared by solution plasma sputtering in NaCl solution.

  6. Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubes

    Energy Technology Data Exchange (ETDEWEB)

    Hershcovitch, A., E-mail: hershcovitch@bnl.gov; Blaskiewicz, M.; Brennan, J. M.; Fischer, W.; Liaw, C.-J.; Meng, W.; Todd, R. [Brookhaven National Laboratory, Upton, New York 11973 (United States); Custer, A.; Dingus, A.; Erickson, M.; Jamshidi, N.; Laping, R.; Poole, H. J. [PVI, Oxnard, California 93031 (United States)

    2015-05-15

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed, fabricated, and operated. The reason for this endeavor is to alleviate the problems of unacceptable resistive heating of stainless steel vacuum tubes in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase the cathode lifetime, a movable magnet package was developed, and the thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced secondary electron yield to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that a 10 μm copper coated stainless steel RHIC tube has a conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. The device details and experimental results are described.

  7. Plasma sputtering robotic device for in-situ thick coatings of long, small diameter vacuum tubesa)

    Science.gov (United States)

    Hershcovitch, A.; Blaskiewicz, M.; Brennan, J. M.; Custer, A.; Dingus, A.; Erickson, M.; Fischer, W.; Jamshidi, N.; Laping, R.; Liaw, C.-J.; Meng, W.; Poole, H. J.; Todd, R.

    2015-05-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed, fabricated, and operated. The reason for this endeavor is to alleviate the problems of unacceptable resistive heating of stainless steel vacuum tubes in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase the cathode lifetime, a movable magnet package was developed, and the thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced secondary electron yield to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that a 10 μm copper coated stainless steel RHIC tube has a conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. The device details and experimental results are described.

  8. Plasma Sputtering Robotic Device for In-Situ Thick Coatings of Long, Small Diameter Vacuum Tubes

    Science.gov (United States)

    Hershcovitch, Ady

    2014-10-01

    A novel robotic plasma magnetron mole with a 50 cm long cathode was designed fabricated & operated. Reason for this endeavor is to alleviate the problems of unacceptable ohmic heating of stainless steel vacuum tubes and of electron clouds, due to high secondary electron yield (SEY), in the BNL Relativistic Heavy Ion Collider (RHIC). The magnetron mole was successfully operated to copper coat an assembly containing a full-size, stainless steel, cold bore, RHIC magnet tubing connected to two types of RHIC bellows, to which two additional pipes made of RHIC tubing were connected. To increase cathode lifetime, movable magnet package was developed, and thickest possible cathode was made, with a rather challenging target to substrate (de facto anode) distance of less than 1.5 cm. Achieving reliable steady state magnetron discharges at such a short cathode to anode gap was rather challenging, when compared to commercial coating equipment, where the target to substrate distance is 10's cm; 6.3 cm is the lowest experimental target to substrate distance found in the literature. Additionally, the magnetron developed during this project provides unique omni-directional uniform coating. The magnetron is mounted on a carriage with spring loaded wheels that successfully crossed bellows and adjusted for variations in vacuum tube diameter, while keeping the magnetron centered. Electrical power and cooling water were fed through a cable bundle. The umbilical cabling system is driven by a motorized spool. Excellent coating adhesion was achieved. Measurements indicated that well-scrubbed copper coating reduced SEY to 1, i.e., the problem of electron clouds can be eliminated. Room temperature RF resistivity measurement indicated that 10 μm Cu coated stainless steel RHIC tube has conductivity close to that of pure copper tubing. Excellent coating adhesion was achieved. Device detail and experimental results will be presented. Work supported by Brookhaven Science Associates, LLC under

  9. Hydrogen-free diamond-like carbon films prepared by microwave electron cyclotron resonance plasma-enhanced direct current magnetron sputtering

    International Nuclear Information System (INIS)

    Hydrogen-free diamond-like carbon (DLC) films were prepared by means of microwave electron cyclotron resonance plasma enhanced direct current magnetron sputtering. To study the influence of enhanced plasma on film fabrication and properties, the structures as well as mechanical and electrical properties of these films were studied as a function of applied microwave power. Results showed that higher microwave power could induce higher plasma density and electron temperature. The hardness increased from 3.5 GPa to 13 GPa with a variation of microwave power from 0 W to 1000 W. The resistivity showed a drastic increase from 4.5 x 104 Ωcm at 0 W to 1.3 x 1010 Ωcm at 1000 W. The variation of the intensity ratio I(D)/I(G) and the position of the G-peak of the DLC films with respect to changes in microwave power were also investigated by Raman spectroscopy.

  10. Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films

    Energy Technology Data Exchange (ETDEWEB)

    Maaloul, L.; Gangwar, R. K.; Morel, S.; Stafford, L., E-mail: luc.stafford@umontreal.ca [Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7 (Canada)

    2015-11-15

    Langmuir probe and trace rare gases optical emission spectroscopy were used to analyze the spatial structure of the electron density and electron energy distribution function (EEDF) in a cylindrical Ar magnetron plasma reactor used for sputter-deposition of ZnO-based thin films. While a typical Bessel (zero order) diffusion profile was observed along the radial direction for the number density of charged particles at 21 cm from the ZnO target, a significant rise of these populations with respect to the Bessel function was seen in the center of the reactor at 4 cm from the magnetron surface. As for the EEDF, it was found to transform from a more or less Maxwellian far from the target to a two-temperature Maxwellian with a depletion of high-energy electrons where magnetic field confinement effects become important. No significant change in the behavior of the electron density and EEDF across a wide range of pressures (5–100 mTorr) and self-bias voltages (115–300 V) was observed during magnetron sputtering of Zn, ZnO, and In{sub 2}O{sub 3} targets. This indicates that sputtering of Zn, In, and O atoms do not play a very significant role on the electron particle balance and electron heating dynamics, at least over the range of experimental conditions investigated.

  11. Thin films of thermoelectric compound Mg{sub 2}Sn deposited by co-sputtering assisted by multi-dipolar microwave plasma

    Energy Technology Data Exchange (ETDEWEB)

    Le-Quoc, H., E-mail: huy.le-quoc@lpsc.in2p3.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Lacoste, A., E-mail: ana.lacoste@ujf-grenoble.fr [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Hlil, E.K. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Bes, A.; Vinh, T. Tan [Laboratoire de Physique Subatomique et de Cosmologie - CNRS/UJF/Grenoble INP, 53 rue des Martyrs, 38026 Grenoble, Cedex (France); Fruchart, D. [Institut Neel, CNRS, BP 166, F-38042, Grenoble, Cedex 9 (France); Skryabina, N. [Department of Physics, Perm State University, 614990 Perm (Russian Federation)

    2011-10-13

    Highlights: > Mg{sub 2}Sn thin films deposited by plasma co-sputtering, on silicon and glass substrates. > Formation of nano-grained polycrystalline films on substrates at room temperature. > Structural properties vary with target biasing and target-substrate distance. > Formation of the hexagonal phase of Mg{sub 2}Sn in certain deposition conditions. > Power factor {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn films doped with {approx}1 at.% Ag. - Abstract: Magnesium stannide (Mg{sub 2}Sn) thin films doped with Ag intended for thermoelectric applications are deposited on both silicon and glass substrates at room temperature by plasma assisted co-sputtering. Characterization by scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffraction confirms the formation of fine-grained polycrystalline thin films with thickness of 1-3 {mu}m. Stoichiometry, microstructure and crystal structure of thin films are found to vary with target biasing and the distance from targets to substrate. Measurements of electrical resistivity and Seebeck coefficient at room temperature show the maximum power factor of {approx}5.0 x 10{sup -3} W K{sup -2} m{sup -1} for stoichiometric Mg{sub 2}Sn thin films doped with {approx}1 at.% Ag.

  12. Optimization of ZnSe-SiO2 nanostructures deposited by radio-frequency magnetron sputtering: Correlations between plasma species and thin film composition, structural and microstructural properties

    International Nuclear Information System (INIS)

    ZnSe nanoparticle doped SiO2 films have been grown on various substrates at different deposition temperatures, radio-frequency power, Argon pressures and substrate to target distances, by means of reactive magnetron sputtering. A detailed study of the correlations between plasma species and thin film composition, structure and morphology is investigated using X-ray reflectivity and diffraction, Raman and optical emission spectroscopies and Rutherford backscattering technique. It is evidenced that the most sensitive species in the plasma is the Selenium and that the optimal deposition parameters correspond to random stress-free films with a high content of quasi-stoechiometric ZnSe cubic nanocrystallites. A few amount of ZnSe in the hexagonal structure is also evidenced in these films. Using proper deposition parameters, the SiO2/ZnSe proportion in the films and the mean ZnSe particles size around 3 nm are easily monitored

  13. Laser spectroscopy of sputtered atoms

    International Nuclear Information System (INIS)

    The use of laser radiation to study the sputtering process is of relatively recent origin. Much has been learned from this work about the basic physics of the sputtering process itself through measurements of velocity and excited state distributions of sputtered atoms and the effects of adsorbates on substrate sputtering yields. Furthermore, the identification, characterization, and sensitive detection of sputtered atoms by laser spectroscopy has led to the development of in situ diagnostics for impurity fluxes in the plasma edge regions of tokamaks and of ultrasensitive methods (ppB Fe in Si) for surface analysis with ultralow (picocoulomb) ion fluences. The techniques involved in this work, laser fluorescence and multiphoton resonance ionization spectroscopy, will be described and illustrations given of results achieved up to now. 55 refs., 5 figs., 1 tab

  14. Sputter target

    Science.gov (United States)

    Gates, Willard G.; Hale, Gerald J.

    1980-01-01

    The disclosure relates to an improved sputter target for use in the deposition of hard coatings. An exemplary target is given wherein titanium diboride is brazed to a tantalum backing plate using a gold-palladium-nickel braze alloy.

  15. Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas employing a Cu2ZnSnS4 target

    Science.gov (United States)

    Nafarizal, Nayan; Sasaki, Koichi

    2016-07-01

    Absolute densities of Cu, Zn, Sn, and S atoms in magnetron sputtering plasmas were measured by ultraviolet absorption spectroscopy and vacuum ultraviolet absorption spectroscopy. A stoichiometric Cu2ZnSnS4 (CZTS) target was used in this work. It was found that, at various Ar pressures, the S density ranged between (2-8) × 1010 cm-3, the Cu and Sn densities ranged between (0.6-3) × 1010 cm-3, and the Zn density ranged between (2-3) × 109 cm-3. The effective depositing flux, which was evaluated from the absolute densities and the sticking probabilities, was comparable with that evaluated from the deposition rate of the CZTS film. However, the composition ratio of Cu, Zn, Sn, and S in the gas phase deviated from the ideal stoichiometry of CZTS. We discussed the possible mechanisms for the difference among the element compositions of the target, the deposited film, and the gas-phase densities.

  16. Stress-induced VO{sub 2} films with M2 monoclinic phase stable at room temperature grown by inductively coupled plasma-assisted reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Okimura, Kunio; Watanabe, Tomo [School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292 (Japan); Sakai, Joe [GREMAN, UMR 7347 CNRS, Universite Francois Rabelais de Tours, Parc de Grandmont 37200 Tours (France)

    2012-04-01

    We report on growth of VO{sub 2} films with M2 monoclinic phase stable at room temperature under atmospheric pressure. The films were grown on quartz glass and Si substrates by using an inductively coupled plasma-assisted reactive sputtering method. XRD-sin{sup 2}{Psi} measurements revealed that the films with M2 phase are under compressive stress in contrast to tensile stress of films with M1 phase. Scanning electron microscopy observations revealed characteristic crystal grain aspects with formation of periodical twin structure of M2 phase. Structural phase transition from M2 to tetragonal phases, accompanied by a resistance change, was confirmed to occur as the temperature rises. Growth of VO{sub 2} films composed of M2 phase crystalline is of strong interest for clarifying nature of Mott transition of strongly correlated materials.

  17. Sputter-etching characteristics of barium-strontium-titanate and bismuth-strontium-tantalate using a surface-wave high-density plasma reactor

    International Nuclear Information System (INIS)

    The etching of barium-strontium-titanate (BST) and bismuth-strontium-tantalate (SBT) deposited using a pulsed laser deposition technique has been investigated using a nonreactive (argon) surface-wave high-density plasma source. The etch rate of the rf-biased thin films was determined as a function of the self-bias voltage, of the magnetic field intensity and of the gas pressure. It was found that high etch rates with a good selectivity over resist can be achieved without any plasma chemistry, provided the plasma is operated in the very low pressure regime (i.e., below 1 mTorr). For SBT, etch rates as high as 3000 Aa/min with a selectivity of 0.2 over HPR-504 photoresist were obtained with self-bias voltages lower than 150 V. It is also found that even though BST and SBT present similar sputter-etching characteristics, SBT is etched about two times faster than BST as a result of the difference in the atomic density of each material

  18. On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

    Science.gov (United States)

    Zheng, B. C.; Meng, D.; Che, H. L.; Lei, M. K.

    2015-05-01

    The modulated pulsed power magnetron sputtering (MPPMS) discharge processes are numerically modeled and experimentally investigated, in order to explore the effect of the pressure on MPPMS discharges as well as on the microstructure of the deposited thin films. A global plasma model has been developed based on a volume-averaged global description of the ionization region, considering the loss of electrons by cross-B diffusion. The temporal variations of internal plasma parameters at different pressures from 0.1 to 0.7 Pa are obtained by fitting the model to duplicate the experimental discharge data, and Cu thin films are deposited by MPPMS at the corresponding pressures. The surface morphology, grain size and orientation, and microstructure of the deposited thin films are investigated by scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. By increasing the pressure from 0.1 to 0.7 Pa, both the ion bombardment energy and substrate temperature which are estimated by the modeled plasma parameters decrease, corresponding to the observed transition of the deposited thin films from a void free structure with a wide distribution of grain size (zone T) into an underdense structure with a fine fiber texture (zone 1) in the extended structure zone diagram (SZD). The microstructure and texture transition of Cu thin films are well-explained by the extended SZD, suggesting that the primary plasma processes are properly incorporated in the model. The results contribute to the understanding of the characteristics of MPPMS discharges, as well as its correlation with the microstructure and texture of deposited Cu thin films.

  19. On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments

    International Nuclear Information System (INIS)

    The modulated pulsed power magnetron sputtering (MPPMS) discharge processes are numerically modeled and experimentally investigated, in order to explore the effect of the pressure on MPPMS discharges as well as on the microstructure of the deposited thin films. A global plasma model has been developed based on a volume-averaged global description of the ionization region, considering the loss of electrons by cross-B diffusion. The temporal variations of internal plasma parameters at different pressures from 0.1 to 0.7 Pa are obtained by fitting the model to duplicate the experimental discharge data, and Cu thin films are deposited by MPPMS at the corresponding pressures. The surface morphology, grain size and orientation, and microstructure of the deposited thin films are investigated by scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. By increasing the pressure from 0.1 to 0.7 Pa, both the ion bombardment energy and substrate temperature which are estimated by the modeled plasma parameters decrease, corresponding to the observed transition of the deposited thin films from a void free structure with a wide distribution of grain size (zone T) into an underdense structure with a fine fiber texture (zone 1) in the extended structure zone diagram (SZD). The microstructure and texture transition of Cu thin films are well-explained by the extended SZD, suggesting that the primary plasma processes are properly incorporated in the model. The results contribute to the understanding of the characteristics of MPPMS discharges, as well as its correlation with the microstructure and texture of deposited Cu thin films

  20. Flexible Solar Cells Using Doped Crystalline Si Film Prepared by Self-Biased Sputtering Solid Doping Source in SiCl4/H2 Microwave Plasma.

    Science.gov (United States)

    Hsieh, Ping-Yen; Lee, Chi-Young; Tai, Nyan-Hwa

    2016-02-01

    We developed an innovative approach of self-biased sputtering solid doping source process to synthesize doped crystalline Si film on flexible polyimide (PI) substrate via microwave-plasma-enhanced chemical vapor deposition (MWPECVD) using SiCl4/H2 mixture. In this process, P dopants or B dopants were introduced by sputtering the solid doping target through charged-ion bombardment in situ during high-density microwave plasma deposition. A strong correlation between the number of solid doping targets and the characteristics of doped Si films was investigated in detail. The results show that both P- and B-doped crystalline Si films possessed a dense columnar structure, and the crystallinity of these structures decreased with increasing the number of solid doping targets. The films also exhibited a high growth rate (>4.0 nm/s). Under optimal conditions, the maximum conductivity and corresponding carrier concentration were, respectively, 9.48 S/cm and 1.2 × 10(20) cm(-3) for P-doped Si film and 7.83 S/cm and 1.5 × 10(20) cm(-3) for B-doped Si film. Such high values indicate that the incorporation of dopant with high doping efficiency (around 40%) into the Si films was achieved regardless of solid doping sources used. Furthermore, a flexible crystalline Si film solar cell with substrate configuration was fabricated by using the structure of PI/Mo film/n-type Si film/i-type Si film/p-type Si film/ITO film/Al grid film. The best solar cell performance was obtained with an open-circuit voltage of 0.54 V, short-circuit current density of 19.18 mA/cm(2), fill factor of 0.65, and high energy conversion of 6.75%. According to the results of bending tests, the critical radius of curvature (RC) was 12.4 mm, and the loss of efficiency was less than 1% after the cyclic bending test for 100 cycles at RC, indicating superior flexibility and bending durability. These results represent important steps toward a low-cost approach to high-performance flexible crystalline Si film

  1. Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS

    Science.gov (United States)

    Hänninen, Tuomas; Schmidt, Susann; Wissting, Jonas; Jensen, Jens; Hultman, Lars; Högberg, Hans

    2016-04-01

    Silicon oxynitride (SiO x N y , x=0.2-1.3, y=0.2 -0.7) thin films were synthesized by reactive high power impulse magnetron sputtering from a pure silicon target in Ar/N2O atmospheres. It was found that the composition of the material can be controlled by the reactive gas flow and the average target power. X-ray photoelectron spectroscopy (XPS) shows that high average powers result in more silicon-rich films, while lower target powers yield silicon-oxide-like material due to more pronounced target poisoning. The amount of nitrogen in the films can be controlled by the percentage of nitrous oxide in the working gas. The nitrogen content remains at a constant level while the target is operated in the transition region between metallic and poisoned target surface conditions. The extent of target poisoning is gauged by the changes in peak target current under the different deposition conditions. XPS also shows that varying concentrations and ratios of oxygen and nitrogen in the films result in film chemical bonding structures ranging from silicon-rich to stoichiometric silicon oxynitrides having no observable Si-Si bond contributions. Spectroscopic ellipsometry shows that the film optical properties depend on the amount and ratio of oxygen and nitrogen in the compound, with film refractive indices measured at 633 nm ranging between those of SiO2 and Si3N4.

  2. Linear and nonlinear optical properties of functionalized CdSe quantum dots prepared by plasma sputtering and wet chemistry.

    Science.gov (United States)

    Humbert, Christophe; Dahi, Abdellatif; Dalstein, Laetitia; Busson, Bertrand; Lismont, Marjorie; Colson, Pierre; Dreesen, Laurent

    2015-05-01

    We develop an innovative manufacturing process, based on radio-frequency magnetron sputtering (RFMS), to prepare neat CdSe quantum dots (QDs) on glass and silicon substrates and further chemically functionalize them. In order to validate the fabrication protocol, their optical properties are compared with those of QDs obtained from commercial solutions and deposited by wet chemistry on the substrates. Firstly, AFM measurements attest that nano-objects with a mean diameter around 13 nm are located on the substrate after RFMS treatment. Secondly, the UV-Vis absorption study of this deposited layer shows a specific optical absorption band, located at 550 nm, which is related to a discrete energy level of QDs. Thirdly, by using two-color sum-frequency generation (2C-SFG) nonlinear optical spectroscopy, we show experimentally the functionalization efficiency of the RFMS CdSe QDs layer with thiol derived molecules, which is not possible on the QDs layer prepared by wet chemistry due to the surfactant molecules from the native solution. Finally, 2C-SFG spectroscopy, performed at different visible wavelengths, highlights modifications of the vibration mode shape whatever the QDs deposition method, which is correlated to the discrete energy level of the QDs.

  3. Generation of High Brightness Electron Beams via Ionization Induced Injection by Transverse Colliding Lasers in a Beam-Driven Plasma Wakefield Accelerator

    CERN Document Server

    Li, F; Xu, X L; Zhang, C J; Yan, L X; Du, Y C; Huang, W H; Cheng, H B; Tang, C X; Lu, W; Joshi, C; Mori, W B; Gu, Y Q

    2013-01-01

    The production of ultra-bright electron bunches using ionization injection triggered by two transversely colliding laser pulses inside a beam-driven plasma wake is examined via three-dimensional (3D) particle-in-cell (PIC) simulations. The relatively low intensity lasers are polarized along the wake axis and overlap with the wake for a very short time. The result is that the residual momentum of the ionized electrons in the transverse plane of the wake is much reduced and the injection is localized along the propagation axis of the wake. This minimizes both the initial 'thermal' emittance and the emittance growth due to transverse phase mixing. 3D PIC simulations show that ultra-short (around 8 fs) high-current (0.4 kA) electron bunches with a normalized emittance of 8.5 and 6 nm in the two planes respectively and a brightness greater than 1.7*10e19 A rad-2 m-2 can be obtained for realistic parameters.

  4. Nonlinear Dynamics of High-Brightness Electron Beams and Beam-Plasma Interactions: Theories, Simulations, and Experiments

    Energy Technology Data Exchange (ETDEWEB)

    C. L. Bohn (deceased), P. Piot and B. Erdelyi

    2008-05-31

    According to its original Statement of Work (SOW), the overarching objective of this project is: 'To enhance substantially the understanding of the fundamental dynamics of nonequilibrium high-brightness beams with space charge.' Our work and results over the past three and half years have been both intense and fruitful. Inasmuch as this project is inextricably linked to a larger, growing research program - that of the Beam Physics and Astrophysics Group (BPAG) - the progress that it has made possible cannot easily be separated from the global picture. Thus, this summary report includes major sections on 'global' developments and on those that can be regarded as specific to this project.

  5. Alamethicin permeabilizes the plasma membrane and mitochondria but not the tonoplast in tobacco (Nicotiana tabacum L. cv Bright Yellow) suspension cells

    DEFF Research Database (Denmark)

    Matic, S.; Geisler, D.A.; Møller, I.M.;

    2005-01-01

    The ion channel-forming peptide AlaM (alamethicin) is known to permeabilize isolated mitochondria as well as animal cells. When intact tobacco (Nicotiana tabacum L.) Bright Yellow-2 cells were treated with AlaM, the cells became permeable for low-molecular-mass molecules as shown by induced leakage...... remained intact, as indicated by an unaffected tonoplast proton gradient. Low-flux permeabilization of plasma membranes and mitochondria at moderate AlaM concentrations was reversible and did not affect cell vigour. Higher AlaM concentrations induced cell death. After the addition of catalase that removes...... the H2O2 necessary for NADH oxidation by apoplastic peroxidases, mitochondrial oxygen consumption could be measured in permeabilized cells. Inhibitor-sensitive oxidation of the respiratory substrates succinate, malate and NADH was observed after the addition of the appropriate coenzymes (ATP, NAD...

  6. Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering

    International Nuclear Information System (INIS)

    Electron cyclotron resonance (ECR) plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon (H-DLC) films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1 x 109 Ω · cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas.

  7. Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties

    International Nuclear Information System (INIS)

    Krypton is sometimes used in physical vapor deposition processes due to its greater atomic mass and size compared to argon, which leads to a lower gas incorporation and may have beneficial effects on kinetics of the coating growth. In this paper, the authors investigate the plasma composition and properties of deposited high power pulse magnetron sputtering Cr-N coatings for discharges with various Ar/Kr ratios and for various pulse lengths of 40 μs, 80 μs, and 200 μs, keeping the average discharge power constant. The results show that an addition of Kr influences the discharge process by altering the ignition and peak values of the discharge current. This influences the metal ion generation and growth conditions on the substrate by reducing the nucleation site densities, leading to a predominantly columnar grow. However, the deposition rate is highest for an Ar/Kr ratio of 120/80. The integral of the metal ion and atom emission exhibits the same trend, having a maximum for Ar/Kr ratio of 120/80. By decreasing the pulse length, the deposition rate of coatings decreases, while the hardness increases

  8. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-01

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  9. In situ plasma sputtering synthesis of ZnO nanorods-Ag nanoparticles hybrids and their application in non-enzymatic hydrogen peroxide sensing.

    Science.gov (United States)

    Zhang, Dan; Zhang, Yuxia; Yang, Chi; Ge, Cunwang; Wang, Yuanhong; Wang, Hao; Liu, Hongying

    2015-08-21

    In this paper, ZnO nanorods-Ag nanoparticles hybrids were first synthesized via a facile, rapid, and in situ plasma sputtering method without using any silver precursor. The obtained materials were then characterized by scanning electron microscopy, high-resolution transmission electron microscopy, energy-dispersive x-ray spectroscopy, and cyclic voltammetry. Based on the electrochemical catalytic properties of the obtained nanohybrids, a non-enzymatic hydrogen peroxide biosensor was constructed by immobilizing the obtained ZnO nanorods-Ag nanoparticles hybrids on the surface of a glassy carbon electrode. Under optimal conditions, the resulting biosensor displayed a good response for H2O2 with a linear range of 0.2 to 12.8 mM, and a detection limit of 7.8 μM at a signal-to-noise ratio of 3. In addition, it exhibited excellent anti-interference ability and fast response. The current work provides a feasible platform to fabricate a variety of non-enzymatic biosensors.

  10. Transport of Sputtered Particles in Capacitive Sputter Sources

    CERN Document Server

    Trieschmann, Jan

    2015-01-01

    The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum. An angular dependent Thompson energy distribution is fitted to results from Monte-Carlo simulations and used for the kinetic simulation of the transport of sputtered aluminum. For the proposed configuration the transport of sputtered particles is characterized under typical process conditions at a gas pressure of p = 0.5 Pa. It is found that - due to the peculiar geometric conditions - the transport can be understood in a one dimensional picture, governed by the interaction of the imposed and backscattered particle fluxes. It is shown that the precise geometric features play an important role only in proximity to the electrode edges, where the effect of backscattering from the outside chamber volume be...

  11. Numerical Study of Hall Thruster Plume and Sputtering Erosion

    Directory of Open Access Journals (Sweden)

    Li Yan

    2012-01-01

    Full Text Available Potential sputtering erosion caused by the interactions between spacecraft and plasma plume of Hall thrusters is a concern for electric propulsion. In this study, calculation model of Hall thruster’s plume and sputtering erosion is presented. The model is based on three dimensional hybrid particle-in-cell and direct simulation Monte Carlo method (PIC/DSMC method which is integrated with plume-wall sputtering yield model. For low-energy heavy-ion sputtering in Hall thruster plume, the Matsunami formula for the normal incidence sputtering yield and the Yamamura angular dependence of sputtering yield are used. The validation of the simulation model is realized through comparing plume results with the measured data. Then, SPT-70’s sputtering erosion on satellite surfaces is assessed and effect of mass flow rate on sputtering erosion is analyzed.

  12. Nanostructured plasma etched, magnetron sputtered nanolaminar Cr{sub 2}AlC MAX phase thin films

    Energy Technology Data Exchange (ETDEWEB)

    Grieseler, Rolf, E-mail: rolf.grieseler@tu-ilmenau.de [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Hähnlein, Bernd; Stubenrauch, Mike [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Kups, Thomas [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Wilke, Marcus [MFPA Weimar, Testing Center for Thin Films and Material Properties at TU Ilmenau, Gustav-Kirchhoff-Str. 5, Ilmenau (Germany); Hopfeld, Marcus [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany); Pezoldt, Jörg [TU Ilmenau, Institute of Micro and Nanotechnologies MacroNano, Chair Nanotechnology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau (Germany); Schaaf, Peter [TU Ilmenau, Institute of Materials Engineering and Institute of Micro and Nanotechnologies MacroNano, Chair Materials for Electronics, Gustav-Kirchhoff-Str. 5, 98693 Ilmenau (Germany)

    2014-02-15

    The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr{sub 2}AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated.

  13. COMMISSIONING OF A HIGH-BRIGHTNESS PHOTOINJECTOR FOR COMPTON SCATTERING X-RAY SOURCES

    Energy Technology Data Exchange (ETDEWEB)

    Anderson, S G; Gibson, D J; Hartemann, F V; Messerly, M; Shverdin, M; Siders, C W; Tremaine, A M; Barty, C J; Badakov, H; Frigola, P; Fukasawa, A; OShea, B; Rosenzweig, J B

    2007-06-21

    Compton scattering of intense laser pulses with ultrarelativistic electron beams has proven to be an attractive source of high-brightness x-rays with keV to MeV energies. This type of x-ray source requires the electron beam brightness to be comparable with that used in x-ray free-electron lasers and laser and plasma based advanced accelerators. We describe the development and commissioning of a 1.6 cell RF photoinjector for use in Compton scattering experiments at LLNL. Injector development issues such as RF cavity design, beam dynamics simulations, emittance diagnostic development, results of sputtered magnesium photo-cathode experiments, and UV laser pulse shaping are discussed. Initial operation of the photoinjector is described.

  14. Magnetron sputtering source

    Science.gov (United States)

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  15. Electrochromic performance of NiV{sub x}O{sub y} thin films deposited onto flexible PET/ITO substrates by reactive plasma sputtering for flexible electrochromic devices

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Y.-S., E-mail: yslin@fcu.edu.t [Department of Chemical Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407, Taiwan (China); Chen, P.-W.; Lin, D.-J. [Department of Chemical Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung 407, Taiwan (China)

    2010-10-01

    An investigation was conducted on the electrochromic properties of plasma sputtered-nickel-vanadium oxide thin films on 40 {Omega}/{open_square} flexible polyethylene terephthalate/indium tin oxide substrates. Metallic Ni{sub 0.93}V{sub 0.07} target, sputtered by radio frequency power with argon gases and reacted with oxygen gases at room temperature (23 {sup o}C), was proven to provide extraordinary electrochromic performance. Cyclic voltammetry switching measurements found that only low driving voltages from - 1 V to 1 V were needed to provide reversible Li{sup +} ion intercalation and deintercalation. The light modulation with up to 52% of transmittance variation, optical density change of 0.446 and color efficiency of 63.8 cm{sup 2}/C at a wavelength of 550 nm was obtained for 200 cycles of Li{sup +} intercalation and deintercalation in a 1 M LiClO{sub 4}-propylene carbonate electrolyte.

  16. Friction and Wear Properties of Selected Solid Lubricating Films. Part 3; Magnetron-Sputtered and Plasma-Assisted, Chemical-Vapor-Deposited Diamondlike Carbon Films

    Science.gov (United States)

    Miyoshi, Kazuhisa; Iwaki, Masanori; Gotoh, Kenichi; Obara, Shingo; Imagawa, Kichiro

    2000-01-01

    To evaluate commercially developed dry solid film lubricants for aerospace bearing applications, an investigation was conducted to examine the friction and wear behavior of magnetron-sputtered diamondlike carbon (MS DLC) and plasma-assisted, chemical-vapor-deposited diamondlike carbon (PACVD DLC) films in sliding contact with 6-mm-diameter American Iron and Steel Institute (AISI) 440C stainless steel balls. Unidirectional sliding friction experiments were conducted with a load of 5.9 N (600 g), a mean Hertzian contact pressure of 0.79 GPa (maximum Hertzian contact pressure of L-2 GPa), and a sliding velocity of 0.2 m/s. The experiments were conducted at room temperature in three environments: ultrahigh vacuum (vacuum pressure, 7x10(exp -7) Pa), humid air (relative humidity, approx.20 percent), and dry nitrogen (relative humidity, films were characterized by scanning electron microscopy, energy-dispersive x-ray spectroscopy, and surface profilometry. Marked differences in the friction and wear of the DLC films investigated herein resulted from the environmental conditions. The main criteria for judging the performance of the DLC films were coefficient of friction and wear rate, which had to be less than 0.3 and on the order of 10(exp -6) cu mm/N-m or less, respectively. MS DLC films and PACVD DLC films met the criteria in humid air and dry nitrogen but failed in ultrahigh vacuum, where the coefficients of friction were greater than the criterion, 0.3. In sliding contact with 440C stainless steel balls in all three environments the PACVD DLC films exhibited better tribological performance (i.e., lower friction and wear) than the MS DLC films. All sliding involved adhesive transfer of wear materials: transfer of DLC wear debris to the counterpart 440C stainless steel and transfer of 440C stainless steel wear debris to the counterpart DLC film.

  17. Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties

    International Nuclear Information System (INIS)

    Magnetron sputtering of transparent conductive oxides (zinc oxide, indium tin oxide, tin oxide) is a promising technique which allows the deposition of films at low temperatures with good optical and electronic properties. A special advantage is the scalability to large areas. The principles underlying magnetron sputtering are reviewed in this paper. The growth process during magnetron sputtering is characterized by the bombardment of the growing film with species from the sputtering target and from the plasma. In addition to sputtered atoms with energies in the eV range, ions from the plasma (mostly argon) and neutral atoms (also argon) reflected at the target hit the growing film. Depending on the energy of these species and on the ion-to-neutral ratio the properties of the films vary. High energies (≥100 eV), which occur mainly at low sputtering pressures lead to damage of the growing film, connected with mechanical stress, small crystallites and bad electrical parameters. Ion assisted growth with low ion energies (below about 50 eV) is advantageous as is a high ion-to-neutral ratio. A compilation of resistivities of magnetron sputtered zinc oxide films yields a limiting resistivity of 2x10-4 Ω cm for polycrystalline films. Based on the correlation between plasma parameters and film properties new search fields are anticipated. (author)

  18. Characterization and modeling of multi-dipolar microwave plasmas: application to multi-dipolar plasma assisted sputtering; Caracterisation et modelisation des plasmas micro-onde multi-dipolaires: application a la pulverisation assistee par plasma multi-dipolaire

    Energy Technology Data Exchange (ETDEWEB)

    Tran, T.V

    2006-12-15

    The scaling up of plasma processes in the low pressure range remains a question to be solved for their rise at the industrial level. One solution is the uniform distribution of elementary plasma sources where the plasma is produced via electron cyclotron resonance (ECR) coupling. These elementary plasma sources are made up of a cylindrical permanent magnet (magnetic dipole) set at the end of a coaxial microwave line. Although of simple concept, the optimisation of these dipolar plasma sources is in fact a complex problem. It requires the knowledge, on one hand, of the configurations of static magnetic fields and microwave electric fields, and, on the other hand, of the mechanisms of plasma production in the region of high intensity magnetic field (ECR condition), and of plasma diffusion. Therefore, the experimental characterisation of the operating ranges and plasma parameters has been performed by Langmuir probes and optical emission spectroscopy on different configurations of dipolar sources. At the same time, in a first analytical approach, calculations have been made on simple magnetic field configurations, motion and trajectory of electrons in these magnetic fields, and the acceleration of electrons by ECR coupling. Then, the results have been used for the validation of the numerical modelling of the electron trajectories by using a hybrid PIC (particle-in-cell) / MC (Monte Carlo) method. The experimental study has evidenced large operating domains, between 15 and 200 W of microwave power, and from 0.5 to 15 mtorr argon pressure. The analysis of plasma parameters has shown that the region of ECR coupling is localised near the equatorial plane of the magnet and dependent on magnet geometry. These characterizations, applied to a cylindrical reactor using 48 sources, have shown that densities between 10{sup 11} and 10{sup 12} cm{sup -3} could be achieved in the central part of the volume at a few mtorr argon pressures. The modelling of electron trajectories near

  19. Sputtering Yield Calculation of Some Candidate PFC Materials

    Institute of Scientific and Technical Information of China (English)

    DENGBaiquan; YANJiancheng; HUANGJinhua

    2001-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and Li bombarded by charged particles H+, D+, T+ and He+ are calculated by application of sputtering theory based on bipartition model of ion transport. The comparisons with Monte-Carlo calculation results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyze the impurity level in core plasma of fusion reactors.

  20. 微波等离子体选育高抗菌活性纳豆杆菌研究%Study on the Selection of High Antimicrobial Activity Bacillus Natto by Microwave Plasma Sputtering

    Institute of Scientific and Technical Information of China (English)

    陈建军; 黄纯纯; 张巧央; 柴央央

    2012-01-01

    应用微波等离子(N+,20w,2min)溅射纳豆芽孢杆菌(Bacillus subtilis natto N102),筛选得到高抗菌活性突变株H332,该突变株抗菌活性对大肠杆菌较亲株提高1.48倍(抑菌圈直径),对金黄色葡萄球菌较亲株提高1.32倍(抑菌圈直径),经过对突变株H332的抗菌状况及其继代稳定性分析,确认获得高抗菌活性菌株采用微波等离子溅射诱变育种技术是一种有效的方法.%Mulagensis H332 was obtained by screening after microwave plasma (N+, 20W, 2min) sputtering of bacillus subtilis natto N102. This mutagensis antibacterial activity to E. coli was 1.48 times (antibacterial circle diameter) higher than that of the original strains N102 and to S. aureus strains was 1.32 times (antibacterial circle diameter) higher than that of the original strains N102. After analysis of subculture stability and antibacterial to the mutant H332, Microwave plasma sputtering was an effective method to gain high antimicrobial activity strains.

  1. Heavy particle transport in sputtering systems

    Science.gov (United States)

    Trieschmann, Jan

    2015-09-01

    This contribution aims to discuss the theoretical background of heavy particle transport in plasma sputtering systems such as direct current magnetron sputtering (dcMS), high power impulse magnetron sputtering (HiPIMS), or multi frequency capacitively coupled plasmas (MFCCP). Due to inherently low process pressures below one Pa only kinetic simulation models are suitable. In this work a model appropriate for the description of the transport of film forming particles sputtered of a target material has been devised within the frame of the OpenFOAM software (specifically dsmcFoam). The three dimensional model comprises of ejection of sputtered particles into the reactor chamber, their collisional transport through the volume, as well as deposition of the latter onto the surrounding surfaces (i.e. substrates, walls). An angular dependent Thompson energy distribution fitted to results from Monte-Carlo simulations is assumed initially. Binary collisions are treated via the M1 collision model, a modified variable hard sphere (VHS) model. The dynamics of sputtered and background gas species can be resolved self-consistently following the direct simulation Monte-Carlo (DSMC) approach or, whenever possible, simplified based on the test particle method (TPM) with the assumption of a constant, non-stationary background at a given temperature. At the example of an MFCCP research reactor the transport of sputtered aluminum is specifically discussed. For the peculiar configuration and under typical process conditions with argon as process gas the transport of aluminum sputtered of a circular target is shown to be governed by a one dimensional interaction of the imposed and backscattered particle fluxes. The results are analyzed and discussed on the basis of the obtained velocity distribution functions (VDF). This work is supported by the German Research Foundation (DFG) in the frame of the Collaborative Research Centre TRR 87.

  2. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  3. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  4. Denton Vacuum Discovery-550 Sputterer

    Data.gov (United States)

    Federal Laboratory Consortium — Description: CORAL Name: Sputter 2 Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements: Specifications / Capabilities:...

  5. Self-sputtering and reflection

    International Nuclear Information System (INIS)

    Self-sputtering and reflection are investigated with the Monte Carlo program TRIMSP. The results include particle and energy reflection coefficients, sputtering yields and sputtered energy versus incident angle and energy. Angular and energy distributions of reflected and sputtered particles are also given. Reflection and sputtering values are compared to show their contributions to selfsputtering. A comparison of calculated sputtering yields and sputtering efficiencies (sputtering energy) with experimental data is carried out. The systems investigated are mainly the bombardment of C, Ni, and W with self-ions. (orig.)

  6. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.;

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  7. Magnetospheric Sputtering Source of the Moon's Exosphere

    Science.gov (United States)

    Moore, L. E.; Wilson, J. K.; Mendillo, M.

    2002-09-01

    Observations of lunar eclipses over the past decade have revealed that the Moon's transient sodium atmosphere at full Moon is both denser and more extended near equinox than it is near solstice. This fact suggests the presence of a variable magnetospheric source of sodium. An investigation of this source is carried out by modeling combinations of two sources: a constant source from micrometeor sputtering and photon-stimulated desorption, and a variable source (presumably plasma sputtering), which is higher during equinox conditions and lower during solstice conditions.

  8. Sputtering of dimers off a silicon surface

    Science.gov (United States)

    Nietiadi, Maureen L.; Rosandi, Yudi; Kopnarski, Michael; Urbassek, Herbert M.

    2012-10-01

    We present experimental and molecular-dynamics simulation results of the sputtering of a Si surface by 2 keV Ar ions. Results on both the monomer and dimer distributions are presented. In simulation, these distributions follow a generalized Thompson law with power exponent n=2 and n=3, respectively. The experimental data, obtained via plasma post-ionization in an SNMS (secondary neutral mass spectrometry) apparatus, show good agreement with respect to the dimer fraction, and the relative energy distributions of dimers and monomers. The consequences for the dimer sputtering mechanism are discussed.

  9. Sputtering of dimers off a silicon surface

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Kopnarski, Michael [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Institut fuer Oberflaechen- und Schichtanalytik IFOS GmbH, Trippstadter Strasse 120, D-67663 Kaiserslautern (Germany); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany); Research Center OPTIMAS, University Kaiserslautern, Erwin-Schroedinger-Strasse, D-67663 Kaiserslautern (Germany)

    2012-10-15

    We present experimental and molecular-dynamics simulation results of the sputtering of a Si surface by 2 keV Ar ions. Results on both the monomer and dimer distributions are presented. In simulation, these distributions follow a generalized Thompson law with power exponent n=2 and n=3, respectively. The experimental data, obtained via plasma post-ionization in an SNMS (secondary neutral mass spectrometry) apparatus, show good agreement with respect to the dimer fraction, and the relative energy distributions of dimers and monomers. The consequences for the dimer sputtering mechanism are discussed.

  10. Discharge Physics of High Power Impulse Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2010-10-13

    High power impulse magnetron sputtering (HIPIMS) is pulsed sputtering where the peak power exceeds the time-averaged power by typically two orders of magnitude. The peak power density, averaged over the target area, can reach or exceed 107 W/m2, leading to plasma conditions that make ionization of the sputtered atoms very likely. A brief review of HIPIMS operation is given in a tutorial manner, illustrated by some original data related to the self-sputtering of niobium in argon and krypton. Emphasis is put on the current-voltage-time relationships near the threshold of self-sputtering runaway. The great variety of current pulse shapes delivers clues on the very strong gas rarefaction, self-sputtering runaway conditions, and the stopping of runaway due to the evolution of atom ionization and ion return probabilities as the gas plasma is replaced by metal plasma. The discussions are completed by considering instabilities and the special case of ?gasless? self-sputtering.

  11. CME impact on Mercury's sputtered exospheric environment

    Science.gov (United States)

    Pfleger, M.; Lichtenegger, H. I. M.; Lammer, H.; Mura, A.; Wurz, P.; Martin-Fernandez, J. A.

    2013-09-01

    Solar wind and magnetospheric plasma precipitation onto the surface of Mercury triggers the formation of exospheric particle populations by sputtering processes. Numerical modeling of Mercury's magnetosphere has shown that the weak intrinsic magnetic field of the planet is sufficient to prevent the equatorial regions from being impacted by solar wind ions during moderate solar wind conditions. However, intense fluxes of protons are expected to hit the auroral regions, giving rise to the release of surface elements at high latitudes by ion sputtering. During high solar wind dynamic pressure conditions in the case of CME events, the solar wind protons will have access to Mercury's entire dayside surface, which may result in a considerable filling of the exosphere by sputtered surface material.

  12. The application of an assisting gas plasma generator for low-temperature magnetron sputtering of Ti-C-Mo-S antifriction coatings on titanium alloys

    OpenAIRE

    Potekaev, A. I.; Savostikov , V. M.; Tabachenko, Aleksandr Nikitich; Dudarev, E. F.; Melnikova, E. A.; Shulepov, Ivan Anisimovich

    2015-01-01

    The positive effect of assisting influence of high-density gas plasma formed by an independent plasma generator PINK on mechanical and tribological characteristics of Ti-C-Mo-S magnetron coating on titanium alloys at lowered to 350°С temperature of coating regardless of alloy structural condition was revealed by methods of calotest, nanorecognition, scratch testing and frictional material tests. The coating formed by means of a combined magnetron plasma method reduces titanium alloys friction...

  13. Development of a high brightness ion source

    International Nuclear Information System (INIS)

    The brightness and emittance of an ion beam can depend on the ion temperature, aberrations and scattering, as well as other factors. However, it is the ion temperature which determines the irreducible minimum value of the emittance and hence brightness, as the other components can be eliminated by careful design. An ion source design is presented which has attained this minimum value for the emittance; the dependence of the ion temperature on the plasma source parameters is discussed

  14. Observations and diagnostics in high brightness beams

    Science.gov (United States)

    Cianchi, A.; Anania, M. P.; Bisesto, F.; Castellano, M.; Chiadroni, E.; Pompili, R.; Shpakov, V.

    2016-09-01

    The brightness is a figure of merit largely used in the light sources, like FEL (Free Electron Lasers), but it is also fundamental in several other applications, as for instance Compton backscattering sources, beam driven plasma accelerators and THz sources. Advanced diagnostics are essential tools in the development of high brightness beams. 6D electron beam diagnostics will be reviewed with emphasis on emittance measurement.

  15. Effect of microstructure of TiN film on properties as bipolar plate coatings in polymer electrolyte membrane fuel cell prepared by inductively coupled plasma assisted magnetron sputtering

    International Nuclear Information System (INIS)

    As potential application in bipolar plate of polymer electrolyte membrane fuel cell, the microstructure, corrosion resistance and the electrical conductivity of titanium nitride (TiN) and Si doped titanium nitride (Ti0.9Si0.1N) films deposited by magnetron sputtering with different bias voltages are investigated by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM), electrochemical test and four-point probe method, respectively. XRD, SEM and AFM results reveal that the texture and topography of TiN film depend on the bias voltage and incorporation of Si. When the bias voltage is − 20 V and − 30 V, the TiN and Ti0.9Si0.1N films exhibit a dense (111) plane preferred growth, denser structure and smoother surface topography. The potentiodynamic test results indicate that the TiN and Ti0.9Si0.1N films have higher chemical inertness and better corrosion resistance. The films can satisfy the requirement of current density for bipolar plate materials. Incorporation of Si element into TiN film makes the passive current density more stable. Four-point probe measurement results show that the resistivity of both TiN and Ti0.9Si0.1N films reaches minimum when the deposition bias voltage is − 20 V. - Highlights: • Dense TiN and Ti0.9Si0.1N films are deposited by magnetron sputtering. • Preferred growth orientation of TiN depends on the bias voltage and Si doping. • TiN and Ti0.9Si0.1N films have excellent corrosion resistance. • Surface conductivity of TiN and Ti0.9Si0.1N films evolves with bias voltage

  16. Design of a Plasma Emission Monitoring System Used in a Reactive Sputtering Coating%反应溅射镀膜的等离子体发射控制系统设计

    Institute of Scientific and Technical Information of China (English)

    肖劲宇; 和军平

    2011-01-01

    A Plasma Emission Monitoring (PEM) control system based on Allen -Bradley PLC Controller is designed by means of PID algorithm in this paper. Sputter coating principle is introduced firstly and its disanvantage is analyzed too. Then a PEM control technology is proposed to improve sputter coating performance. Besides discussing the sensor, actuator and controller. PID control program in PLC is introduced. A prototype is built up and it works normally. In the end, several process related elements that affect the accuracy, the stability of PEM control loop are also mentioned.%介绍了一种基于Allen- Bradley可编程控制器的等离子体发射监控闭环控制系统;在介绍溅射镀膜工作原理的基础上,分析了影响镀膜性能的多个因素,提出了等离子体发射监控反应溅射镀膜的控制方案;进而,具体介绍了等离子体发射监控系统的传感器、执行器的结构与设计,并进行了PLC- PID控制软件的编程,实现了快速、稳定的控制功能,使反应溅射镀膜工作均匀;实际运行证明了本等离子发射监控设计合理性,可制备氮化钛、氧化钛化合物薄膜,具有良好的推广价值.

  17. RF Sputtering for preparing substantially pure amorphous silicon monohydride

    Science.gov (United States)

    Jeffrey, Frank R.; Shanks, Howard R.

    1982-10-12

    A process for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicon produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous silicon hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  18. The application of an assisting gas plasma generator for low- temperature magnetron sputtering of Ti-C-Mo-S antifriction coatings on titanium alloys

    Science.gov (United States)

    Potekaev, A. I.; Savostikov, V. M.; Tabachenko, A. N.; Dudarev, E. F.; Melnikova, E. A.; Shulepov, I. A.

    2015-11-01

    The positive effect of assisting influence of high-density gas plasma formed by an independent plasma generator PINK on mechanical and tribological characteristics of Ti-C- Mo-S magnetron coating on titanium alloys at lowered to 350°C temperature of coating regardless of alloy structural condition was revealed by methods of calotest, nanorecognition, scratch testing and frictional material tests. The coating formed by means of a combined magnetron plasma method reduces titanium alloys friction coefficient in multiple times and increases wear resistance by two orders of magnitude. At the same time the mechanical properties of ultra-fine-grained titanium alloys obtained by nanostructuring do not deteriorate.

  19. New Description Model of Sputtering on Material Surface

    Institute of Scientific and Technical Information of China (English)

    邓柏权; 严建成; 黄锦华; 彭利林

    2003-01-01

    In order to estimate the erosion rates of some plasma facing component materials, the sputtering yields of Mo, W and deuterium-saturated Li bombarded by fusion charged particles are calculated by application of new sputtering physics description methods based on the bipartition model of ion transport theory. The comparisons with Monte Carlo calculation and experimental results are made. These data might be useful to estimate the lifetime of plasma facing components and to analyse the impurity level in core plasma of fusion reactors.

  20. Compression and strong rarefaction in high power impulse magnetron sputtering discharges

    Energy Technology Data Exchange (ETDEWEB)

    Horwat, David; Anders, Andre

    2010-11-11

    Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.

  1. Burkina Faso - BRIGHT II

    Data.gov (United States)

    Millenium Challenge Corporation — Millennium Challenge Corporation hired Mathematica Policy Research to conduct an independent evaluation of the BRIGHT II program. The three main research questions...

  2. Cross-field diode sputtering target assembly

    International Nuclear Information System (INIS)

    An improved cross-field diode sputtering target assembly adapted for sputtering a selected material having an ion target wherein a selected surface is formed of a selected material in a predetermined closed loop pattern having a central opening therein, and wherein the selected surface has spaced edges and is formed of a material adapted to be controllably eroded in a diode sputtering process, walls positioned contiguous or adjacent to each of the spaced edges of the selected surface wherein each of the walls extend substantially normal from and beyond each spaced edge of the selected surface of the ion target and a magnetic member having poles positioned in an opposed spaced relationship to each other and enclosing the walls and the ion target for providing a linear magnetic field through the walls, over the selected surface and through the ion target and wherein the magnetic member has a linear magnetic field of sufficient strength for plasma entrapment between the walls and over the selected surface wherein the selected surface is adapted to have an electric field applied thereacross at a direction substantially normal to the magnetic field to develop a BXE field and to entrap secondary electrons at the selected surface to control the erosion pattern thereof is shown. A method for utilizing the improved cross-field diode sputtering target assembly is also shown

  3. Anion formation in sputter ion sources by neutral resonant ionization

    Energy Technology Data Exchange (ETDEWEB)

    Vogel, J. S., E-mail: johnsvogel@yahoo.com [University of California, 8300 Feliz Creek Dr., Ukiah, California 95482 (United States)

    2016-02-15

    Focused Cs{sup +} beams in sputter ion sources create mm-diameter pits supporting small plasmas that control anionization efficiencies. Sputtering produces overwhelmingly neutral products that the plasma can ionize as in a charge-change vapor. Electron capture between neutral atoms rises as the inverse square of the difference between the ionization potential of the Cs state and the electron affinity of the sputtered atom, allowing resonant ionization at very low energies. A plasma collision-radiation model followed electronic excitation up to Cs(7d). High modeled Cs(7d) in a 0.5 mm recess explains the 80 μA/mm{sup 2} C{sup −} current density compared to the 20 μA/mm{sup 2} from a 1 mm recess.

  4. Anion formation in sputter ion sources by neutral resonant ionization

    International Nuclear Information System (INIS)

    Focused Cs+ beams in sputter ion sources create mm-diameter pits supporting small plasmas that control anionization efficiencies. Sputtering produces overwhelmingly neutral products that the plasma can ionize as in a charge-change vapor. Electron capture between neutral atoms rises as the inverse square of the difference between the ionization potential of the Cs state and the electron affinity of the sputtered atom, allowing resonant ionization at very low energies. A plasma collision-radiation model followed electronic excitation up to Cs(7d). High modeled Cs(7d) in a 0.5 mm recess explains the 80 μA/mm2 C− current density compared to the 20 μA/mm2 from a 1 mm recess

  5. Sunspot Bright Points

    CERN Document Server

    Choudhary, Debi Prasad

    2010-01-01

    We used the flux calibrated images through the Broad Band Filter Imager and Stokes Polarimeter data obtained with the Solar Optical Telescope onboard the Hinode spacecraft to study the properties of bright points in and around the sunspots. The well isolated bright points were selected and classified as umbral dot, peripheral umbral dot, penumbral grains and G-band bright point depending on their location. Most of the bright points are smaller than about 150 km. The larger points are mostly associated with the penumbral features. The bright points are not uniformly distributed over the umbra but preferentially located around the penumbral boundary and in the fast decaying parts of umbra. The color temperature of the bright points, derived using the continuum irradiance, are in the range of 4600 K to 6600 K with cooler ones located in the umbra. The temperature increases as a function of distance from the center to outside. The G-band, CN-band and CaII H flux of the bright points as a function of their blue ba...

  6. Hydorgen sputtering of carbon thin films deposited on platinum

    International Nuclear Information System (INIS)

    Carbon has been suggested as a suitable low Z element for the lining of the first walls of controlled thermonuclear reactors in order to reduce radiative plasma losses due to sputtering. In this paper the measurement of sputtering of carbon thin films by protons in the energy range 0.6-10.0 keV, is described. H2+ or H3+ ions were used as bombarding ions to obtain equivalent H+ sputtering yields at energies below that at which the ion source provides sufficient proton current. The sputter yield was found to range from 7x10-3-1.5x10-2 atoms/proton with a broad maximum in the 2.0 keV region with the carbon film kept near ambient temperature. (B.D.)

  7. Discharge current modes of high power impulse magnetron sputtering

    Directory of Open Access Journals (Sweden)

    Zhongzhen Wu

    2015-09-01

    Full Text Available Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

  8. Magnetron sputtering system stabilisation for high rate desposition of AlN films

    DEFF Research Database (Denmark)

    Fomin, A; Akhmatov, Vladislav; Selishchev, S

    1998-01-01

    The stabilisation of a planar magnetron sputtering system for reactive sputtering of AlN in a gaseous mixture of Ar and highly active NH3 was examined. The helical instability in the cathode plasma sheath was observed and methods for its damping were proposed. It was found that the deposition of c...

  9. Low-energy BO and BO 2 emission from H 2BO 3 sputtered in a low-pressure high-frequency SNMS plasma

    Science.gov (United States)

    Jenett, Holger; Ai, Xingtao; Hodoroaba, Vasile-Dan; Iga, Ione; Mu Tao, Lee

    1999-07-01

    Background corrected secondary neutral energy spectra derived from Cu powder pellets with H 3BO 3, MgO, Al 2O 3, TiO 2, Y 2O 3 and ZrO 2, show energy distributions being more or less typical for collision cascades in the cases of the metal ions M +, of O + at energies >5 eV above the ion generation potential, and of the molecules Cu 2+, AlO +, TiO +, YO + and ZrO +, whereas the larger parts of the energy distributions of BO +and BO 2+exhibit a similar shape as the Ar +plasma gas ions. From this, and from the background of the low decomposition and melting temperatures of H 3BO 3 and B 2O 3, respectively, we conclude that the detected BO and BO 2 molecules have been emitted with thermal energies in processes implying lower energies than collision cascades. Evidence was found that the same holds for HBO 2 and H 2BO 2. In order to obtain relative correction factors for MO + molecular ion intensities, electron impact ionization cross sections have been calculated for the light MO molecules using the binary-encounter Bethe (BEB) formula, and for the respective metal M atoms by means of the semiempirical Lotz formula. For the heavy MO molecules YO and ZrO, cross sections have been estimated using the Thomson formula. The comparison of corrected relative MO/M and M/Cu intensities yields evidence that thermal (H)BO x emission amounts to the same order of magnitude as B emission from collision cascades, and that this situation is comparable to the high yield of MO molecules emitted in collision cascades from oxides with high M masses. Since the normal energy window of an HF-plasma secondary neutral mass spectrometer does not accept particles with originally thermal energies, it is concluded that these findings are relevant for quantification.

  10. Sputtering of W-Mo alloy under ion bombardment

    Institute of Scientific and Technical Information of China (English)

    1999-01-01

    The distribution of plasma density in the vicinity of the W-Mo alloy source in the process of dou ble-glow discharge plasma surface alloying was diagnosed using the moveable Langmuir probe. The sputtering law, surface composition and morphological variation of the W-Mo alloy source was studied. The experimental results show that there exists obvious preferential sputtering on the surface of the W-Mo alloy source under the argon ion bombardment; the stable period is reached after a transitional period, and the preferential sputtering occurs in a definite range of composition(mole fraction): 70 % ~ 75 % Mo, 22 % ~ 25 % W; there appears segregation on the surface of the W-Mo alloy source.

  11. RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

    NARCIS (Netherlands)

    Hattum, E.D. van

    2007-01-01

    RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology, w

  12. Mass distribution of sputtered cathode material in the reflex discharge along the magnetic field mirror configuration

    International Nuclear Information System (INIS)

    he paper is concerned with the distribution of cathode material sputtered under the action of the pulsed reflex discharge plasma and deposited on the anode surface (vacuum chamber) by means of a set of discrete receiving plates. Correlative relationship has been found between the weight gain increase of the receiving plates due to the deposition of cathode material (Ti) particles on them and the increasing magnetic field regions. The maximum possible sputtering yield Ycurr has been evaluated. The authors have deduced parametric dependences of the sputtering ratio on the power function exponent that determines the shape of the radial plasma-density profile, and also, on the magnetic field induction value

  13. Study of the chemical sputtering in Tore-Supra

    International Nuclear Information System (INIS)

    The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C2Dx and C3Dy) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD4 (YCD4) is highly flux (φ) dependent, showing a variation of the form: YCD4 ∝ φ-0.23. The experimental study also reveals that an increase of the surface temperature induces an augmentation of YCD4. The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, μm wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 μm of tungsten. (author)

  14. The brightness of colour.

    Directory of Open Access Journals (Sweden)

    David Corney

    Full Text Available BACKGROUND: The perception of brightness depends on spatial context: the same stimulus can appear light or dark depending on what surrounds it. A less well-known but equally important contextual phenomenon is that the colour of a stimulus can also alter its brightness. Specifically, stimuli that are more saturated (i.e. purer in colour appear brighter than stimuli that are less saturated at the same luminance. Similarly, stimuli that are red or blue appear brighter than equiluminant yellow and green stimuli. This non-linear relationship between stimulus intensity and brightness, called the Helmholtz-Kohlrausch (HK effect, was first described in the nineteenth century but has never been explained. Here, we take advantage of the relative simplicity of this 'illusion' to explain it and contextual effects more generally, by using a simple Bayesian ideal observer model of the human visual ecology. We also use fMRI brain scans to identify the neural correlates of brightness without changing the spatial context of the stimulus, which has complicated the interpretation of related fMRI studies. RESULTS: Rather than modelling human vision directly, we use a Bayesian ideal observer to model human visual ecology. We show that the HK effect is a result of encoding the non-linear statistical relationship between retinal images and natural scenes that would have been experienced by the human visual system in the past. We further show that the complexity of this relationship is due to the response functions of the cone photoreceptors, which themselves are thought to represent an efficient solution to encoding the statistics of images. Finally, we show that the locus of the response to the relationship between images and scenes lies in the primary visual cortex (V1, if not earlier in the visual system, since the brightness of colours (as opposed to their luminance accords with activity in V1 as measured with fMRI. CONCLUSIONS: The data suggest that perceptions

  15. CA BrightStor

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    CA推出的BrightStor系列存储管理解决方案已经成为企业电子商务体系架构管理战略中举足轻重的组成部分。BrightStor是一整套企业级的智能化存储管理解决方案,定位在存储硬件设备和上层应用之间,通过各种集成化的产品和工具为驻留在企业任何位置的数据提供全方位的、有效的存储管理和保护。

  16. Bright Economic Prospects

    Institute of Scientific and Technical Information of China (English)

    Zhang Minqiu

    2004-01-01

    @@ India is expected to register an 8.2% growth rate for the 2003-04 fiscal year. The overall economic situation this year has been satisfactory despite the scaled down 6-6.5% growth rate for the new fiscal year due to oil price hikes, reduced monsoon volume and some 7% inflation. Judging from the following factors, bright prospects are in store for the country down the road.

  17. Review of strategies for a comprehensive simulation in sputtering devices

    CERN Document Server

    Gentile, Antonio A

    2012-01-01

    The development of sputtering facilities, at the moment, is mainly pursued through experimental tests, or simply by expertise in the field, and relies much less on numerical simulation of the process environment. This leads to great efforts and empirically, roughly optimized solutions: in fact, the simulation of these devices, at the state of art, is quite good in predicting the behavior of single steps of the overall deposition process, but it seems still ahead a full integration among the tools simulating the various phenomena involved in a sputter. We summarize here the techniques and codes already available for problems of interest in sputtering facilities, and we try to outline the possible features of a comprehensive simulation framework. This framework should be able to integrate the single paradigms, dealing with aspects going from the plasma environment up to the distribution and properties of the deposited film, not only on the surface of the substrate, but also on the walls of the process chamber.

  18. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  19. Low surface brightness galaxies

    Science.gov (United States)

    Vanderhulst, J. M.; Deblok, W. J. G.; Mcgaugh, S. S.; Bothun, G. D.

    1993-01-01

    A program to investigate the properties of low surface brightness (LSB) galaxies involving surface photometry in U, B, V, R, I, and H-alpha, HI imaging with the Westerbork Synthesis Radio Telescope (WSRT) and the very large array (VLA) and spectrophotometry of H2 regions in LSB galaxies is underway. The goal is to verify the idea that LSB galaxies have low star formation rates because the local gas density falls below the critical density for star formation, and to study the stellar population and abundances in LSB galaxies. Such information should help understanding the evolutionary history of LSB galaxies. Some preliminary results are reported.

  20. RF sputtering for controlling dihydride and monohydride bond densities in amorphous silicon hydride

    Science.gov (United States)

    Jeffery, F.R.; Shanks, H.R.

    1980-08-26

    A process is described for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicone produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous solicone hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  1. Very low pressure high power impulse triggered magnetron sputtering

    Science.gov (United States)

    Anders, Andre; Andersson, Joakim

    2013-10-29

    A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

  2. Using the Multipole Resonance Probe to Stabilize the Electron Density During a Reactive Sputter Process

    Science.gov (United States)

    Oberberg, Moritz; Styrnoll, Tim; Ries, Stefan; Bienholz, Stefan; Awakowicz, Peter

    2015-09-01

    Reactive sputter processes are used for the deposition of hard, wear-resistant and non-corrosive ceramic layers such as aluminum oxide (Al2O3) . A well known problem is target poisoning at high reactive gas flows, which results from the reaction of the reactive gas with the metal target. Consequently, the sputter rate decreases and secondary electron emission increases. Both parameters show a non-linear hysteresis behavior as a function of the reactive gas flow and this leads to process instabilities. This work presents a new control method of Al2O3 deposition in a multiple frequency CCP (MFCCP) based on plasma parameters. Until today, process controls use parameters such as spectral line intensities of sputtered metal as an indicator for the sputter rate. A coupling between plasma and substrate is not considered. The control system in this work uses a new plasma diagnostic method: The multipole resonance probe (MRP) measures plasma parameters such as electron density by analyzing a typical resonance frequency of the system response. This concept combines target processes and plasma effects and directly controls the sputter source instead of the resulting target parameters.

  3. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  4. Elementary surface processes during reactive magnetron sputtering of chromium

    Energy Technology Data Exchange (ETDEWEB)

    Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von [Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum (Germany)

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  5. Influence of ion source configuration and its operation parameters on the target sputtering and implantation process.

    Science.gov (United States)

    Shalnov, K V; Kukhta, V R; Uemura, K; Ito, Y

    2012-06-01

    In the work, investigation of the features and operation regimes of sputter enhanced ion-plasma source are presented. The source is based on the target sputtering with the dense plasma formed in the crossed electric and magnetic fields. It allows operation with noble or reactive gases at low pressure discharge regimes, and, the resulting ion beam is the mixture of ions from the working gas and sputtering target. Any conductive material, such as metals, alloys, or compounds, can be used as the sputtering target. Effectiveness of target sputtering process with the plasma was investigated dependently on the gun geometry, plasma parameters, and the target bias voltage. With the applied accelerating voltage from 0 to 20 kV, the source can be operated in regimes of thin film deposition, ion-beam mixing, and ion implantation. Multi-component ion beam implantation was applied to α-Fe, which leads to the surface hardness increasing from 2 GPa in the initial condition up to 3.5 GPa in case of combined N(2)-C implantation. Projected range of the implanted elements is up to 20 nm with the implantation energy 20 keV that was obtained with XPS depth profiling. PMID:22755619

  6. Coronal bright points associated with minifilament eruptions

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Junchao; Jiang, Yunchun; Yang, Jiayan; Bi, Yi; Li, Haidong [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Yang, Bo; Yang, Dan, E-mail: hjcsolar@ynao.ac.cn [Also at Graduate School of Chinese Academy of Sciences, Beijing, China. (China)

    2014-12-01

    Coronal bright points (CBPs) are small-scale, long-lived coronal brightenings that always correspond to photospheric network magnetic features of opposite polarity. In this paper, we subjectively adopt 30 CBPs in a coronal hole to study their eruptive behavior using data from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory. About one-quarter to one-third of the CBPs in the coronal hole go through one or more minifilament eruption(s) (MFE(s)) throughout their lifetimes. The MFEs occur in temporal association with the brightness maxima of CBPs and possibly result from the convergence and cancellation of underlying magnetic dipoles. Two examples of CBPs with MFEs are analyzed in detail, where minifilaments appear as dark features of a cool channel that divide the CBPs along the neutral lines of the dipoles beneath. The MFEs show the typical rising movements of filaments and mass ejections with brightenings at CBPs, similar to large-scale filament eruptions. Via differential emission measure analysis, it is found that CBPs are heated dramatically by their MFEs and the ejected plasmas in the MFEs have average temperatures close to the pre-eruption BP plasmas and electron densities typically near 10{sup 9} cm{sup –3}. These new observational results indicate that CBPs are more complex in dynamical evolution and magnetic structure than previously thought.

  7. Coronal bright points associated with minifilament eruptions

    International Nuclear Information System (INIS)

    Coronal bright points (CBPs) are small-scale, long-lived coronal brightenings that always correspond to photospheric network magnetic features of opposite polarity. In this paper, we subjectively adopt 30 CBPs in a coronal hole to study their eruptive behavior using data from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory. About one-quarter to one-third of the CBPs in the coronal hole go through one or more minifilament eruption(s) (MFE(s)) throughout their lifetimes. The MFEs occur in temporal association with the brightness maxima of CBPs and possibly result from the convergence and cancellation of underlying magnetic dipoles. Two examples of CBPs with MFEs are analyzed in detail, where minifilaments appear as dark features of a cool channel that divide the CBPs along the neutral lines of the dipoles beneath. The MFEs show the typical rising movements of filaments and mass ejections with brightenings at CBPs, similar to large-scale filament eruptions. Via differential emission measure analysis, it is found that CBPs are heated dramatically by their MFEs and the ejected plasmas in the MFEs have average temperatures close to the pre-eruption BP plasmas and electron densities typically near 109 cm–3. These new observational results indicate that CBPs are more complex in dynamical evolution and magnetic structure than previously thought.

  8. Are the argon metastables important in high power impulse magnetron sputtering discharges?

    Energy Technology Data Exchange (ETDEWEB)

    Gudmundsson, J. T., E-mail: tumi@hi.is [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland); Lundin, D.; Minea, T. M. [Laboratoire de Physique des Gaz et Plasmas - LPGP, UMR 8578 CNRS, Université Paris-Sud, 91405 Orsay Cedex (France); Stancu, G. D. [CentraleSupélec, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); CNRS, UPR 288 Laboratoire EM2C, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex (France); Brenning, N. [Department of Space and Plasma Physics, School of Electrical Engineering, KTH Royal Institute of Technology, SE-100 44 Stockholm (Sweden); Plasma and Coatings Physics Division, IFM-Materials Physics, Linköping University, SE-581 83 Linköping (Sweden)

    2015-11-15

    We use an ionization region model to explore the ionization processes in the high power impulse magnetron sputtering (HiPIMS) discharge in argon with a titanium target. In conventional dc magnetron sputtering (dcMS), stepwise ionization can be an important route for ionization of the argon gas. However, in the HiPIMS discharge stepwise ionization is found to be negligible during the breakdown phase of the HiPIMS pulse and becomes significant (but never dominating) only later in the pulse. For the sputtered species, Penning ionization can be a significant ionization mechanism in the dcMS discharges, while in the HiPIMS discharge Penning ionization is always negligible as compared to electron impact ionization. The main reasons for these differences are a higher plasma density in the HiPIMS discharge, and a higher electron temperature. Furthermore, we explore the ionization fraction and the ionized flux fraction of the sputtered vapor and compare with recent experimental work.

  9. Surface charging of thick porous water ice layers relevant for ion sputtering experiments

    Science.gov (United States)

    Galli, A.; Vorburger, A.; Pommerol, A.; Wurz, P.; Jost, B.; Poch, O.; Brouet, Y.; Tulej, M.; Thomas, N.

    2016-07-01

    We use a laboratory facility to study the sputtering properties of centimeter-thick porous water ice subjected to the bombardment of ions and electrons to better understand the formation of exospheres of the icy moons of Jupiter. Our ice samples are as similar as possible to the expected moon surfaces but surface charging of the samples during ion irradiation may distort the experimental results. We therefore monitor the time scales for charging and discharging of the samples when subjected to a beam of ions. These experiments allow us to derive an electric conductivity of deep porous ice layers. The results imply that electron irradiation and sputtering play a non-negligible role for certain plasma conditions at the icy moons of Jupiter. The observed ion sputtering yields from our ice samples are similar to previous experiments where compact ice films were sputtered off a micro-balance.

  10. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Corbella, Carles; Grosse-Kreul, Simon; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; Keudell, Achim von [RD Plasmas with Complex Interactions, Ruhr-Universität Bochum, Universitätsstr. 150, 44780 Bochum (Germany)

    2013-10-15

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP)

  11. High rate sputtering of corrosion-resistant alloys

    International Nuclear Information System (INIS)

    High corrosion-resitant films of amorphous Fe sub(80-X)Cr sub(X)P sub(13)C sub(7), Fe45Cr30Mo5P13C7, Cr70C30, Cr75B25 and Ti75B25 were deposited by dc-triode sputtering on water-cooled copper substrate. X-ray diffractometry showed a few diffraction patterns that characterize the amorphous structure for deposited films. High sputtering rate of about 0.1 μm/min was achieved by applying high ion current densities to the sputtering target under 10-2 Torr of Ar gas. The high dense Ar plasma ions were produced using a plasma generator. The microhardness of amorphous Cr70C30, Cr75B25 and Ti75B25 were 1288, 1168 and 1081, respectively. The films, which contain high corrosion resitant alloying elements such as Cr and Ti, show extremely high corrosion resistance, particularly pitting corrosion resistance in IN HCI. The high corrosion resistance of these films is attributable to the enrichment of Cr and Ti in the passive films. (author)

  12. Formation and stability of sputtered clusters

    International Nuclear Information System (INIS)

    Current theory for the formation of sputtered clusters states that either atoms are sputtered individually and aggregate after having left the surface or they are sputtered as complete clusters. There is no totally sharp boundary between the two interpretations, but experimental evidence is mainly thought to favour the latter model. Both theories demand a criterion for the stability of the clusters. In computer simulations of sputtering, the idea has been to use the same interaction potential as in the lattice computations to judge the stability. More qualitatively, simple geometrical shapes have also been looked for. It is found here, that evidence for 'magic numbers' and electron parity effects in clusters have existed in the sputtering literature for a long time, making more sophisticated stability criteria necessary. The breakdown of originally sputtered metastable clusters into stable clusters gives strong support to the 'sputtered as clusters' hypothesis. (author)

  13. Sputtering technology in solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1978-01-01

    Potential and present sputtering technology is discussed as it applies to the deposition of solid film lubricants particularly MoS2, WS2, and PTFE. Since the sputtered films are very thin, the selection of the sputtering parameters and substrate condition is very critical as reflected by the lubricating properties. It was shown with sputtered MoS2 films that the lubricating characteristics are directly affected by the selected sputtering parameters (power density, pressure, sputter etching, dc-biasing, etc.) and the substrate temperature, chemistry, topography and the environmental conditions during the friction tests. Electron microscopy and other surface sensitive analytical techniques illustrate the resulting changes in sputtered MoS2 film morphology and chemistry which directly influence the film adherence and frictional properties.

  14. Metal plasmas for the fabrication of nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2006-09-21

    A review is provided covering metal plasma production, theenergetic condensation of metal plasmas, and the formation ofnanostructures using such plasmas. Plasma production techniques includepulsed laser ablation, filtered cathodic arcs, and various forms ofionized physical vapor deposition, namely magnetron sputtering withionization of sputtered atoms in radio frequency discharges,self-sputtering, and high power impulse magnetron sputtering. Thediscussion of energetic condensation focuses on the control of kineticenergy by biasing and also includes considerations of the potentialenergy and the processes occurring at subplantation and implantation. Inthe final section on nanostructures, two different approaches arediscussed. In the top-down approach, the primary nanostructures arelithographically produced and metal plasma is used to coat or filltrenches and vias. Additionally, multilayers with nanosize periods(nanolaminates) can be produced. In the bottom-up approach, thermodynamicforces are used to fabricate nanocomposites and nanoporous materials bydecomposition and dealloying.

  15. In-situ sputtering apparatus

    Science.gov (United States)

    Erickson, Mark R.; Poole, Henry J.; Custer, III, Arthur W.; Hershcovitch, Ady

    2015-06-09

    A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

  16. Collision-spike Sputtering of Au Nanoparticles.

    Science.gov (United States)

    Sandoval, Luis; Urbassek, Herbert M

    2015-12-01

    Ion irradiation of nanoparticles leads to enhanced sputter yields if the nanoparticle size is of the order of the ion penetration depth. While this feature is reasonably well understood for collision-cascade sputtering, we explore it in the regime of collision-spike sputtering using molecular-dynamics simulation. For the particular case of 200-keV Xe bombardment of Au particles, we show that collision spikes lead to abundant sputtering with an average yield of 397 ± 121 atoms compared to only 116 ± 48 atoms for a bulk Au target. Only around 31 % of the impact energy remains in the nanoparticles after impact; the remainder is transported away by the transmitted projectile and the ejecta. The sputter yield of supported nanoparticles is estimated to be around 80 % of that of free nanoparticles due to the suppression of forward sputtering.

  17. Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering

    OpenAIRE

    Purandare, Y. P.; Ehiasarian, A.P.; Hovsepian, P. E.

    2008-01-01

    Nanoscale multilayer CrN/NbN physical vapor deposition (PVD) coatings are gaining reputation for their high corrosion and wear resistance. However, the CrN/NbN films deposited by ABS(TM) (are bond sputtering) technology have some limitations such as macrodroplets, porosity, and less dense structures. The novel HIPIMS (high power impulse magnetron sputtering) technique produces macroparticle-free, highly ionized metal plasma, which brings advantages in both surface pretreatment and coating dep...

  18. Teradiode's high brightness semiconductor lasers

    Science.gov (United States)

    Huang, Robin K.; Chann, Bien; Burgess, James; Lochman, Bryan; Zhou, Wang; Cruz, Mike; Cook, Rob; Dugmore, Dan; Shattuck, Jeff; Tayebati, Parviz

    2016-03-01

    TeraDiode is manufacturing multi-kW-class ultra-high brightness fiber-coupled direct diode lasers for industrial applications. A fiber-coupled direct diode laser with a power level of 4,680 W from a 100 μm core diameter, lasers. The fiber-coupled output corresponds to a Beam Parameter Product (BPP) of 3.5 mm-mrad and is the lowest BPP multi-kW-class direct diode laser yet reported. This laser is suitable for industrial materials processing applications, including sheet metal cutting and welding. This 4-kW fiber-coupled direct diode laser has comparable brightness to that of industrial fiber lasers and CO2 lasers, and is over 10x brighter than state-of-the-art direct diode lasers. We have also demonstrated novel high peak power lasers and high brightness Mid-Infrared Lasers.

  19. Calculation of the density of sputtered metal in the vicinity of the TEXTOR reference limiter

    International Nuclear Information System (INIS)

    The density of the metal atoms from wall sputtering in the marginal plasma layer of Textor is measured by laser-induced fluorescence spectroscopy. Measurements in the vicinity of the semispherical reference limiter showed a decrease of the metal atom density in radial direction towards the core plasma and a maximum metal atom density in toroidal direction. The intensity and location of the peak are determined by the position of the reference limiter relative to the core plasma. In the direct vicinity of the core plasma, where sputtering of the limiter surface is mainly caused by the ions of the marginal plasma layer, the peak is very high and shifted towards the ion side with reference to the flux direction. The author investigates the effects of the geometry of the sputtered reference limiter and the characteristic length of the plasma density profile in the marginal layer on the metal atom density distribution. The theory is formulated initially for exponential plasma density profiles and constant electron temperature. (orig./GG)

  20. Swift chemical sputtering and potential development for fusion reactor materials

    Energy Technology Data Exchange (ETDEWEB)

    Bjoerkas, C.; Juslin, N.; Nordlund, K.; Keinonen, J. (Univ. of Helsinki, Dept. of Physics (Finland)); Traeskelin, P. (Univ. of California at Davis, Dept. of Chemical Engineering and Materials Science, CA (United States)); Salonen, E. (Helsinki Univ. of Technology, Lab. of Physics (Finland)); Krasheninnikov, A.V.

    2008-10-15

    One of the objectives of the International Thermonuclear Experimental Reactor (ITER) is to demonstrate prolonged fusion power production in deuterium-tritium plasma. The selection of plasma facing materials (PFMs) is a key issue for this objective, and multiple factors have to be taken into account. These include the lifetime of the materials (shortened by e.g. erosion and thermal fatigue), safety requirements (tritium retention and activation) and engineering aspects. Due to the ITER tokamak plasma design, the thermal load and particle flux are divided between different areas in the reactor. Consequently, the material requirements vary with location and the current choice for first wall material is beryllium and the divertor region is to be composed of carbon-fibre-composites (CFC) (strike point tiles) and tungsten (baffle and dome). When energetic atoms or ions escape from the hot plasma in a fusion reactor and hit a wall material, they can cause the material to erode. The erosion is well understood if the ion energy is high enough that the erosion is caused by physical sputtering, i.e. when the ion collides with a sample atom and directly kicks it out of the sample. Alternatively ions with thermal energies can also cause erosion if a chemical etching reaction can take place. In the particular case of hydrogen escaping from a fusion reactor plasma and hitting a carbon-based wall material, high carbon erosion has been observed for hydrogen ion energies which are so low (10-30 eV) that physical sputtering is impossible. On the other hand, no chemical etching reaction has been able to explain the erosion either. Using classical and quantum mechanical atomistic simulations of the ion-sample collision dynamics, we have shown that the observed erosion can be explained by a chemical sputtering mechanism, where the incoming ion attacks a chemical bond between two carbon atoms, and causes the bond to break. This mechanism requires an ion energy of only about 3 eV, and

  1. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro

    OpenAIRE

    Petrantoni, Marine; Rossi, Carole; Salvagnac, Ludovic; Conédéra, Véronique; Estève, Alain; Tenailleau, Christophe; Alphonse, Pierre; Chabal, Yves J.

    2010-01-01

    Multilayered Al/CuO thermite was deposited by a dc reactive magnetron sputtering method. Pure Al and Cu targets were used in argon–oxygen gas mixture plasma and with an oxygen partial pressure of 0.13 Pa. The process was designed to produce low stress (

  2. Disorder-free sputtering method on graphene

    Directory of Open Access Journals (Sweden)

    Xue Peng Qiu

    2012-09-01

    Full Text Available Deposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to make transparent devices. However, the sputtering process causes damage to graphene because of high energy sputtered atoms. By flipping the substrate and using a high Ar pressure, we demonstrate that the level of damage to graphene can be reduced or eliminated in dc, rf, and reactive sputtering processes.

  3. The EUVE bright source list

    Science.gov (United States)

    Stroozas, B.; Mcdonald, K.; Antia, B.; Mcdonald, J.; Wiercigroch, A.

    1993-01-01

    Initial results for bright extreme ultraviolet sources discovered during the EUVE all-sky and deep ecliptic surveys have been published as a Bright Source List (BSL) and released to the astronomical community with a recent NASA research announcement (NRA 93-OSS-02, Appendix F). This paper describes the data processing software, the EUVE survey data set, and the production of the BSL at the Center for EUV Astrophysics. The contents, format, and selection criteria for sources, the data processing strategy, some problems encountered, and a summary of the BSL results are presented.

  4. All things bright and beautiful

    OpenAIRE

    Brown, Chloe

    2012-01-01

    'All Things Bright and Beautiful' was exhibited in 20/21 Visual Arts Centre, Scunthorpe, which is sited in a 'redundant' church. The fundamental question that the exhibition explored concerned the role of 'the animal' within contemporary art and within secular society, which in turn hoped to prompt reflections on our understanding of the place of 'the human' in the world and in nature. If there is no divine order, as posited by the hymn 'All Things Bright and Beautiful', where does this leave...

  5. Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering%等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO_2薄膜的实验研究

    Institute of Scientific and Technical Information of China (English)

    赵嘉学; 王军生

    2009-01-01

    The TiO_2 films were grown by mid-frequency dual magnetron reactive sputtering.The dedicated plasma emission monitoring (PEM) system was installed to control in real time the film growth conditions and to eliminate the hysteresis effect and target poisoning.The PEM set-point significantly affects the reliability of the film growth control,the deposition rate,and the microstructures of the deposited compounds.The deposition rate should depend on the PEM set-point linearly,and the reactive sputtering can be well stabilized at any PEM set-point in the transition state.The experimental results show that there is a critical range of the PEM set-point for a specific compound film with a given stoichiometry,and that it makes no sense to increase the deposition rate at a PEM set-point beyond this critical range.%在一个孪生靶实验装置上进行了中频反应磁控溅射沉积TiO_2薄膜的工艺实验.得到了一组真实的反应溅射TiO_2薄膜的沉积速率和真空与反应气体流量之间关系的迟滞曲线(无等离子体发射监控系统Plasma Emission Monitoring,PEM)参与.介绍了PEM参与下的反应溅射TiO_2的一些实验现象和结果,此时TiO_2的沉积速率与PEM设定值呈很好的线性关系,反应溅射可以稳定在过渡态的任一工作点.设定值是PEM控制系统最关键的参数,直接决定着控制的可靠性、反应溅射速率以及薄膜的微观结构.结果表明,为了得到标准化学配比的反应物,PEM的设定值不能超过某个极限值.要在保证化学配比也就是反应物的成分或结构的前提下提高沉积速率才有意义.

  6. Bright flares in supergiant fast X-ray transients

    Science.gov (United States)

    Shakura, N.; Postnov, K.; Sidoli, L.; Paizis, A.

    2014-08-01

    At steady low-luminosity states, supergiant fast X-ray transients (SFXTs) can be at the stage of quasi-spherical settling accretion on to slowly rotating magnetized neutron stars from the OB-companion winds. At this stage, a hot quasi-static shell is formed above the magnetosphere, the plasma entry rate into magnetosphere is controlled by (inefficient) radiative plasma cooling, and the accretion rate on to the neutron star is suppressed by a factor of ˜30 relative to the Bondi-Hoyle-Littleton value. Changes in the local wind velocity and density due to, e.g. clumps, can only slightly increase the mass accretion rate (a factor of ˜10) bringing the system into the Compton-cooling-dominated regime and led to the production of moderately bright flares (Lx ≲ 1036 erg s-1). To interpret the brightest flares (Lx > 1036 erg s-1) displayed by the SFXTs within the quasi-spherical settling accretion regimes, we propose that a larger increase in the mass accretion rate can be produced by sporadic capture of magnetized stellar wind plasma. At sufficiently low accretion rates, magnetic reconnection can enhance the magnetospheric plasma entry rate, resulting in copious production of X-ray photons, strong Compton cooling and ultimately in unstable accretion of the entire shell. A bright flare develops on the free-fall time-scale in the shell, and the typical energy released in an SFXT bright flare corresponds to the mass of the shell. This view is consistent with the energy released in SFXT bright flares (˜1038-1040 erg), their typical dynamic range (˜100) and with the observed dependence of these characteristics on the average unflaring X-ray luminosity of SFXTs. Thus, the flaring behaviour of SFXTs, as opposed to steady HMXBs, may be primarily related to their low X-ray luminosity allowing sporadic magnetic reconnection to occur during magnetized plasma entry into the magnetosphere.

  7. In-situ observation of sputtered particles for carbon implanted tungsten during energetic isotope ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Oya, Y.; Sato, M.; Uchimura, H.; Okuno, K. [Graduate School of Science, Shizuoka University, Shizuoka (Japan); Ashikawa, N.; Sagara, A. [National Institute for Fusion Science, Gifu (Japan); Yoshida, N. [Institute for Applied Mechanics, Kyushu University, Kasuga (Japan); Hatano, Y. [Hydrogen Isotope Research Center, University of Toyama, Toyama (Japan)

    2015-03-15

    Tungsten is a candidate for plasma facing materials in future fusion reactors. During DT plasma operations, carbon as an impurity will bombard tungsten, leading to the formation of tungsten-carbon (WC) layer and affecting tritium recycling behavior. The effect of carbon implantation for the dynamic recycling of deuterium, which demonstrates tritium recycling, including retention and sputtering, has been investigated using in-situ sputtered particle measurements. The C{sup +} implanted W, WC and HOPG were prepared and dynamic sputtered particles were measured during H{sub 2}{sup +} irradiation. It has been found that the major hydrocarbon species for C{sup +} implanted tungsten is CH{sub 3}, while for WC and HOPG (Highly Oriented Pyrolytic Graphite) it is CH{sub 4}. The chemical state of hydrocarbon is controlled by the H concentration in a W-C mixed layer. The amount of C-H bond and the retention of H trapped by carbon atom should control the chemical form of hydrocarbon sputtered by H{sub 2}{sup +} irradiation and the desorption of CH{sub 3} and CH{sub 2} are due to chemical sputtering, although that for CH is physical sputtering. The activation energy for CH{sub 3} desorption has been estimated to be 0.4 eV, corresponding to the trapping process of hydrogen by carbon through the diffusion in W. It is concluded that the chemical states of hydrocarbon sputtered by H{sub 2}{sup +} irradiation for W is determined by the amount of C-H bond on the W surface. (authors)

  8. Characterization of high power impulse magnetron sputtering discharges

    Science.gov (United States)

    Hala, Matej

    Paper I: In the first paper, we present a new approach in the characterization of the high power pulsed magnetron sputtering (HiPIMS) discharge evolution—time- and species-resolved plasma imaging—employing a set of band-pass optical interference filters suitable for the isolation of the emission originating from different species populating the plasma. We demonstrate that the introduction of such filters can be used to distinguish different phases of the discharge, and to visualize numerous plasma effects including background gas excitations during the discharge ignition, gas shock waves, and expansion of metal-rich plasmas. In particular, the application of this technique is shown on the diagnostics of the 200 µs long non-reactive HiPIMS discharges using a Cr target. Paper II: In order to gain further information about the dynamics of reactive HiPIMS discharges, both fast plasma imaging and time- and space-resolved optical emission spectroscopy (OES) are used for a systematic investigation of the 200 µs long HiPIMS pulses operated in Ar, N2 and N 2/Ar mixtures and at various pressures. It is observed that the dense metal plasma created next to the target propagates in the reactor at a speed ranging from 0.7 to 3.5 km s-1, depending on the working gas composition and the pressure. In fact, it increases with higher N 2 concentration and with lower pressure. The visible form of the propagating plasma wave changes from a hemispherical shape in Ar to a drop-like shape extending far from the target with increasing N2 concentration, owing to the significant emission from molecular N2. Interestingly, the evidence of the target self-sputtering is found for all investigated conditions, including pure N2 atmosphere. Paper III: Here, we report on the time- and species-resolved plasma imaging analysis of the dynamics of the 200 µs long HiPIMS discharges above a Cr target ignited in pure O2. It is shown that the discharge emission is dominated solely by neutral and

  9. Bright Transients discovered by PSST

    Science.gov (United States)

    Smith, K. W.; Wright, D.; Smartt, S. J.; Young, D. R.; Huber, M.; Chambers, K. C.; Flewelling, H.; Willman, M.; Primak, N.; Schultz, A.; Gibson, B.; Magnier, E.; Waters, C.; Tonry, J.; Wainscoat, R. J.; Foley, R. J.; Jha, S. W.; Rest, A.; Scolnic, D.

    2016-08-01

    Six bright transients have been discovered as part of the Pan-STARRS Survey for Transients (PSST). Information on all objects discovered by the Pan-STARRS Survey for Transients is available at http://star.pst.qub.ac.uk/ps1threepi/ (see Huber et al. ATel #7153).

  10. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    Sudhir Chandra; Vivekanand Bhatt; Ravindra Singh

    2009-08-01

    Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires deposition of films such as SiO2, Si34, ZnO, polysilicon, phosphosilicate glass (PSG), Al, Cr-Au, Pt, etc. for use as structural, sacrificial, piezoelectric and conducting material. Deposition of these materials at low temperature is desirable for fabricating sensors/actuators on temperature-sensitive substrates and also for integrating MEMS structures on silicon in post-CMOS processing procedures. Plasma enhanced chemical vapour deposition (PECVD) and sputtering are amongst potential techniques for preparing films for MEMS fabrication at comparatively low temperatures. The sputtering technique has an added advantage that the process is carried out in an inert ambient (argon) and chemically sensitive substrate/sacrificial layers can be used in realization of MEMS. Furthermore, the same system can be used for depositing dielectric, piezoelectric and conducting materials as per requirement in the fabrication sequence. This enables rapid low-cost prototyping of MEMS with minimum fabrication facilities. In the present work, we report preparation, characterization and application of RF sputtered SiO2, Si34 and ZnO films for MEMS fabrication. The effect of RF power, sputtering pressure and target-to-substrate spacing was investigated on the structural and other properties of the films. The residual stress in the films was obtained using wafer curvature measurement technique. The deposition parameters are optimized to obtain low stress films of SiO2 and Si34. The self-heating of the substrate during deposition was advantageously exploited to obtain highly -axis oriented films of ZnO without any external heating. A variety of MEMS structures such as cantilever beams, micro-bridges, diaphragms, etc. are demonstrated using bulk, surface and surface-bulk micromachining techniques.

  11. Low yield sputtering of monocrystalline metals

    NARCIS (Netherlands)

    Veen, A. van; Fluit, J.M.

    1980-01-01

    Sputtering of monocrystalline metals by light noble gas ions is studied experimentally and theoretically at low primary ion energy. Evidence is found for a multiple collision process in which surface atoms are sputtered by backscattered ions. The introduction of the maximum recoil energy EM in the s

  12. SnS thin-films by RF sputtering at room temperature

    International Nuclear Information System (INIS)

    Tin monosulfide (SnS) is of interest as a potential solar cell absorber material. We present a preliminary investigation of the effects of sputtering conditions on SnS thin-film structural, optical, and electronic properties. Films were RF sputtered from an SnS target using an argon plasma. Resistivity, stoichiometry, phase, grain size and shape, bandgap, and optical absorption coefficient can be varied by modifying argon pressure for a fixed deposition time. Most films have an indirect bandgap in the range of 1.08-1.18 eV. XRD patterns confirmed the films as mostly crystalline, and grain morphology was examined using profile and surface SEM images.

  13. DC Magnetron sputtering of Y-Ba-Cu-O thin films

    International Nuclear Information System (INIS)

    I have been studying dc magnetron sputtering of thin film YBa2Cu3O6+x, one of the recently discovered high- temperatures superconductors. In the introduction a brief review of the subjects sputtering and superconductivity is given. Since partial pressure measurements, especially for oxygen, have been important in the work I include a short description of the operating principles of mass spectroscopy. Experimental results in addition to what is given in the papers concerning plasma are presented in an appendix at the end of the introduction. (au)

  14. Rf sputtering of CdTE and CdS for thin film PV

    Energy Technology Data Exchange (ETDEWEB)

    Compaan, A.D.; Tabory, C.N.; Shao, M.; Fischer, A.; Feng, Z.; Bohn, R.G. (Department of Physics and Astronomy, University of Toledo, Toledo, Ohio 43606 (United States))

    1994-06-30

    In late 1992 we demonstrated the first rf sputtered CdS/CdTe photovoltaic cell with efficiency exceeding 10%. In this cell both CdS and CdTe layers were deposited by rf sputtering. In this paper we report preliminary measurements of (1) optical emission spectroscopy of the rf plasma, (2) the width of the phonon Raman line as a function of deposition temperature for CdS, and (3) studies of oxygen doping during pulsed laser deposition of CdTe.

  15. Confined ion beam sputtering device and method

    Science.gov (United States)

    Sharp, D.J.

    1986-03-25

    A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received through either one or both ends of the open cylindrical target is forced by a negative bias applied to the target to diverge so that ions impinge at acute angles at different points of the cylindrical target surface. The ion impingement results in a radially inward and downstream directed flux of sputter deposit particles that are received by the substrate. A positive bias applied to the substrate enhances divergence of the approaching ion beams to generate a higher sputtered deposition flux rate. Alternatively, a negative bias applied to the substrate induces the core portion of the ion beams to reach the substrate and provide ion polishing of the sputtered deposit thereon.

  16. Comparative study of ITO and TiN fabricated by low-temperature RF biased sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Simon, Daniel K., E-mail: daniel.simon@namlab.com; Schenk, Tony; Dirnstorfer, Ingo; Fengler, Franz P. G.; Jordan, Paul M.; Krause, Andreas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden (Germany); Tröger, David [Westsächsische Hochschule Zwickau, Fachgruppe Nanotechnologie, Dr.-Friedrichs-Ring 2a, 08056 Zwickau (Germany); Mikolajick, Thomas [NaMLab gGmbH, Nöthnitzerstr. 64, 01187 Dresden, Germany and TU Dresden, Institut für Halbleiter- und Mikrosystemtechnik (IHM), 01062 Dresden (Germany)

    2016-03-15

    Radio frequency (RF) biasing induced by a second plasma source at the substrate is applied to low-temperature sputtering processes for indium tin oxide (ITO) and titanium nitride (TiN) thin films. Investigations on crystal structure and surface morphology show that RF-biased substrate plasma processes result in a changed growth regime with different grain sizes and orientations than those produced by processes without a substrate bias. The influence of the RF bias is shown comparatively for reactive RF-sputtered ITO and reactive direct-current-sputtered TiN. The ITO layers exhibit an improved electrical resistivity of 0.5 mΩ cm and an optical absorption coefficient of 0.5 × 10{sup 4 }cm{sup −1} without substrate heating. Room-temperature sputtered TiN layers are deposited that possess a resistivity (0.1 mΩ cm) of 3 orders of magnitude lower than, and a density (5.4 g/cm{sup 3}) up to 45% greater than, those obtained from layers grown using the standard process without a substrate plasma.

  17. Hydrogen-ion sputtering of borated graphite

    International Nuclear Information System (INIS)

    The development and choice of material for the first wall and other energy-stressed parts of the discharge chamber are an important aspect of fusion reactor construction. In particular, carbon-graphite materials are proposed for making limiters and protective shields of the first wall and receiving plates of diverter devices. Sputtering under ion bombardment is one of the main mechanisms of material erosion; in addition, in the case of carbon-graphite materials chemical sputtering also occurs as a result of the formation of highly volatile hydrocarbon compounds during the reaction with ions of hydrogen isotopes. Sputtering MPG carbon-graphite materials and USB-15 carbon-fiber-reinforced glass ceramic has been well studied and experimental data have been obtained on the coefficients of physical and chemical sputtering. It has been determined that hydrogen-ion sputtering of USB-15 in the range from room temperature to 1070 K is less than that of MPG-8 graphite a factor of 2-10. Bulk doping of graphite with boron substantially reduces chemical sputtering. Since processes in the surface layers are crucially important in sputtering, the possibility of reducing chemical sputtering by surface boration of carbon-graphite materials has been explored. The objective of this work was to continue the experimental investigation to determine the physical processes of sputtering of surface-borated graphite under hydrogen-ion bombardment in the temperature range corresponding to maximum chemical sputtering. Surface boration of MPG-8 and USB-15 samples was carried out by vapor-phase isothermal deposition mediated by gaseous iodine at 1223 K for 4 h (the sample was placed in a pure boron stock). The mass transfer during the vapor-phase deposition is based on the difference of the chemical potentials of iodine and carbon under isothermal conditions. The samples of the initial and borated carbon-graphite materials irradiated with a poly-energetic beam of hydrogen ions

  18. The influence of target oxygen on the YBa2Cu3O6+δ direct-current magnetron sputtering process

    International Nuclear Information System (INIS)

    The oxygen partial pressure and the target potential have been monitored under a range of process conditions during single target direct-current (dc) magnetron sputtering of Y--Ba--Cu--O. The introduced sputtering gas consisted in most instances of pure argon and hence the oxygen present in the plasma originated mainly from the target. During the first hours of sputtering the oxygen partial pressure was of the same magnitude as the argon pressure (3.0 Pa) and the film composition was off stoichiometric. During the sputtering the oxygen pressure decreased, the target potential increased and the film composition became more stoichiometric. After 30--40 h of sputtering the target potential and the oxygen pressure stabilized and the film composition was equal to that of the stoichiometric target. If an oxygen flow exceeding a critical level was mixed into the sputtering gas the target potential and the deposition rate decreased swiftly. This was due to target oxidation. In some instances the stabilization after ''presputtering'' in pure argon was incomplete and oscillations in target voltage and oxygen partial pressure were observed. The fluctuations made it virtually impossible to obtain stoichiometric films. The oscillative behavior of the sputtering process is tentatively explained by a target temperature dependent oxygen diffusion

  19. Helmholtz bright and boundary solitons

    Energy Technology Data Exchange (ETDEWEB)

    Christian, J M [Joule Physics Laboratory, School of Computing, Science and Engineering, Institute for Materials Research, University of Salford, Salford M5 4WT (United Kingdom); McDonald, G S [Joule Physics Laboratory, School of Computing, Science and Engineering, Institute for Materials Research, University of Salford, Salford M5 4WT (United Kingdom); Chamorro-Posada, P [Departmento de TeorIa de la Senal y Comunicaciones e IngenierIa Telematica, Universidad de Valladolid, ETSI Telecomunicacion, Campus Miguel Delibes s/n, 47011 Valladolid (Spain)

    2007-02-16

    We report, for the first time, exact analytical boundary solitons of a generalized cubic-quintic nonlinear Helmholtz (NLH) equation. These solutions have a linked-plateau topology that is distinct from conventional dark soliton solutions; their amplitude and intensity distributions are spatially delocalized and connect regions of finite and zero wave-field disturbances (suggesting also the classification as 'edge solitons'). Extensive numerical simulations compare the stability properties of recently derived Helmholtz bright solitons, for this type of polynomial nonlinearity, to those of the new boundary solitons. The latter are found to possess a remarkable stability characteristic, exhibiting robustness against perturbations that would otherwise lead to the destabilizing of their bright-soliton counterparts.

  20. GPM Intercalibrated Radiometer Brightness Temperatures

    Science.gov (United States)

    Stocker, Erich Franz; Chou, Joyce

    2013-04-01

    One of the keys to consistent precipitation retrieval from passive microwave radiometer measurements (whether imagers or sounders) is accurate, long-term consistent brightness temperature retrievals. This becomes doubly important when there measurements are taken from radiometers on multiple platforms, from multiple agencies, with many different purposes. The Global Precipitation Measurement (GPM) mission addresses this issue directly with the production of intercalibrated brightness temperatures from all the partner satellites contributing to the GPM mission. These intercalibrated brightness temperatures are given the product designation: 1C within GPM. This paper will describe the GPM approach to intercalibration 1C products. The intercalibration and creation of the products uses a 5-step methodology: comparison of the partner standard products (either Tb or Ta) with the GPM reference standard; determination of adjustments that should be made to each product to create consistent brightness temperatures; re-orbitization of all orbits (in non-realtime) to be in the standard GPM south-south orbit; application of the adjustments to the partner provide 1B(or 1A) products; production of 1C products in HDF5 using a "standard" logical format for any radiometer regardless of its 1B format. This paper describes each of these steps and provides the background for them. It discusses in some detail the current 1C logical format and why this format facilitates use by downstream product algorithms and end-users. Most importantly it provides the analysis approach established by the GPM inter-calibration working group in establishing the adjustments to be made at the 1C level. Finally, using DMSP F16-18, it provides examples of the 1C products and discusses the adjustments that are made.

  1. Bright solitons from defocusing nonlinearities

    OpenAIRE

    Borovkova, Olga V.; Kartashov, Yaroslav; Torner Sabata, Lluís; Malomed, Boris A.

    2011-01-01

    We report that defocusing cubic media with spatially inhomogeneous nonlinearity, whose strength increases rapidly enough toward the periphery, can support stable bright localized modes. Such nonlinearity landscapes give rise to a variety of stable solitons in all three dimensions, including one-dimensional fundamental and multihump states, two-dimensional vortex solitons with arbitrarily high topological charges, and fundamental solitons in three dimensions. Solitons maintain their coherence ...

  2. The influence of target oxygen on the YBa2Cu3O6+δ DC Magnetron sputtering process

    International Nuclear Information System (INIS)

    The oxygen partial pressure and the target potential have been monitored under a range of process conditions during single target dc magnetron sputtering of Y-Ba-Cu-O. The introduced sputtering gas consisted in all but one instance of pure argon and hence the oxygen present in the plasma originated mainly from the target. During the first hours of sputtering the oxygen partial pressure was of the same magnitude as the argon pressure (3.0 Pa). As the oxygen was released from the target and subsequently removed by pumping, the target potential increased and the film composition became more stoichiometric. After 30-40 hours of sputtering the target potential and the oxygen pressure stabilized and the film composition was equal to that of the stoichiometric target. If an oxygen flow exceeding a critical level was mixed into the sputtering gas the target potential and the deposition rate decreased swiftly. This was due to target oxidation, further manifested in changing plasma and target colours. In some instances the stabilization after 'presputtering' was incomplete and oscillations in target voltage and oxygen partial pressure were observed. The fluctuations made it virtually impossible to obtain stoichiometric films. The oscillative behaviour of the sputtering process is tentatively explained by a target temperature dependent oxygen diffusion. (au)

  3. High brightness semiconductor lasers with reduced filamentation

    DEFF Research Database (Denmark)

    McInerney, John; O'Brien, Peter.; Skovgaard, Peter M. W.;

    1999-01-01

    High brightness semiconductor lasers have applications in spectroscopy, fiber lasers, manufacturing and materials processing, medicine and free space communication or energy transfer. The main difficulty associated with high brightness is that, because of COD, high power requires a large aperture...

  4. Impact of sputter deposition parameters on molybdenum nitride thin film properties

    International Nuclear Information System (INIS)

    Molybdenum and molybdenum nitride thin films are presented, which are deposited by reactive dc magnetron sputtering. The influence of deposition parameters, especially the amount of nitrogen during film synthesization, to mechanical and electrical properties is investigated. The crystallographic phase and lattice constants are determined by x-ray diffraction analyses. Further information on the microstructure as well as on the biaxial film stress are gained from techniques such as transmission electron microscopy, scanning electron microscopy and the wafer bow. Furthermore, the film resistivity and the temperature coefficient of resistance are measured by the van der Pauw technique starting from room temperature up to 300 °C. Independent of the investigated physical quantity, a dominant dependence on the sputtering gas nitrogen content is observed compared to other deposition parameters such as the plasma power or the sputtering gas pressure in the deposition chamber. (paper)

  5. Transparent conducting ZnO:Ga films prepared on PEN substrates by using RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Jeong-Yeon; Kim, Byeong-Guk; Lee, Seok-Jin; Park, Seung-Beum; Park, Jae-Hwan; Lim, Dong-Gun; Kweon, Soon-Yong [Chungju National University, Chungju (Korea, Republic of)

    2010-05-15

    The use of transparent conducting oxide films on polymer substrates has increased, as these substrates are suitable for flexible displays and optoelectronics. In this research, we studied the effects of O{sub 2} plasma pretreatment on the properties of Ga-doped zinc- oxide (GZO) films on PEN substrates. The films were fabricated using the RF magnetron sputtering process. To improve the surface adhesion and the electrical properties, the O{sub 2} plasma pretreatment process prior to GZO sputtering. With the appropriate O{sub 2} plasma treatment, the resistivity of the GZO films on the PEN substrates was 1.5 x 10{sup -3} ohm-cm. The transmittance of the films on the substrates at a wavelength of 550 nm was about 90%.

  6. Lithium debris removal by sputtering and evaporation for EUV optics and applications

    Science.gov (United States)

    Neumann, M. J.; Cruce, M. J.; Ruzic, D. N.

    2008-03-01

    The selection of extreme ultraviolet (EUV) light as the next generation lithography light source as been a natural progression of the development in the semiconductor industry based on past history of chip size and the projection of where chip sizes will go. The sources of EUV light convert about 1-4% of net deposited plasma energy into photons between 13-14 nm, the remaining energy generates out of band radiation and the production of highly energetic ions and neutrals in the dense hot plasma that move outwards in all directions. A fraction of these ions strike electrode surfaces, injection nozzles, and the vacuum chamber producing low-energy sputtered atoms termed debris. There are limitations to various mitigation schemes and some debris will still reach the collector optics. As such, the mechanism and ability of Li removal from the collector like optics needs to be studied and modeled to be able to provide a predictive value for lifetime of the optics. This removal can be accomplished with the presence of a secondary helium plasma which can selectively sputter lithium from the collector optic surface while providing high EUV photon transmission and have the advantage of being a nondestructive in situ cleaning method for the collector optics. This will allow development of long lasting collector optics and operating regimes in addition to expanding the knowledge base about lithium transport and interaction. First, a lithium magnetron source was developed to provide low energy lithium debris like that which is present in EUV sources. This magnetron was plasma was characterized through the use Langmuir probe analysis to yield a mapping of the temperature and density of the plasma, in addition to the ionization fraction. From here, a secondary helium plasma source was developed, employed, and studied in the same manner to also provide information on the electron density, temperature, and ionization fraction so as to accurately model and measure the deposition flux

  7. Sputtering properties of redeposited graphite surfaces

    International Nuclear Information System (INIS)

    Sputtering yields for carbon redeposited films, put down in the presence of high neutral hydrogen and helium background concentrations, have been measured. The data were obtained using the ion-surface interaction system (ISIS) which is an ion beam sputtering system capable of creating redeposited films and measuring sputtering yields. Yields were determined by calibrated collection of a portion of the sputtered material onto a quartz-crystal-microbalance. Incident ion beam energies ranged from 100 eV up to 10 keV. Sputtering yields for hydrogen and helium bombardment of redeposited films created in ISIS from targets of Union Carbide ATJ graphite are reported. In addition, yields obtained from ISIS proton and deuteron bombardment of Poco AXF-5Q graphite surfaces previously modified in PISCES are also presented. Measurements of sputtering yields from pristine, bulk samples are reported for comparison. Hydrogen sputtering yields from redeposited films generated in ISIS are 2.5 times higher than those of pristine ATJ at an incident energy of 100 eV. Above 200 eV, the hydrogen yields are a factor of 1.4 higher for the redeposited material. Helium yields are 34 times greater for redeposited films at 100 eV and remain as much as 10 times greater above 500 eV. Curve-fits to the data, obtained by incorporating an effective surface binding energy for the redeposited film into a semi-empirical yield expression, are also presented. (orig.)

  8. High-brightness rf linear accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Jameson, R.A.

    1986-01-01

    The issue of high brightness and its ramifications in linacs driven by radio-frequency fields is discussed. A history of the RF linacs is reviewed briefly. Some current applications are then examined that are driving progress in RF linacs. The physics affecting the brightness of RF linacs is then discussed, followed by the economic feasibility of higher brightness machines. (LEW)

  9. Ion beam sputter implantation method

    International Nuclear Information System (INIS)

    By means of ion beam atomizing or sputtering an integrally composed coating, the composition of which continuously changes from 100% of the substrate to 100% of the coating, can be surfaced on a substrate (e.g. molten quartz on plastic lenses). In order to do this in the facility there is directed a primary beam of accelerated noble gas ions on a target from the group of the following materials: SiO2, Al2O3, Corning Glass 7070, Corning Glass 7740 or borosilicate glass. The particles leaving the target are directed on the substrate by means of an acceleration potential of up to 10 KV. There may, however, be coated also metal layers (Ni, Co) on a mylar film resulting in a semireflecting metal film. (RW)

  10. Sputtering of Surfaces of the Solid Hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith;

    1998-01-01

    Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution of the s......Sputtering of the solid hydrogens by electrons and ions exhibits features that may be related to quantum properties of these solids, i.e. a drastic enhancement of the yield for electron–bombarded thick deuterium films and a thermal peak at low ejection energies in the energy distribution...... of the sputtered particles....

  11. Sputter process diagnostics by negative ions

    Science.gov (United States)

    Zeuner, Michael; Neumann, Horst; Zalman, Jan; Biederman, Hynek

    1998-05-01

    We measured the energy distributions of negative ions during reactive sputtering of silicon in oxygen. Various oxygen containing negative ions are formed in the cathode sheath or directly at the sputter target, respectively. These negative ions are accelerated away from the cathode by the electrical field, and can be detected using a mass spectrometer facing the sputter magnetron. The origin of each ion can be determined from peak structures in the energy distribution. Additionally the flux of different negative ions provides information on poisoning of the target by oxide films.

  12. Composition of sputtered material from CuNi alloy during Xe + ion sputtering at elevated temperatures

    Science.gov (United States)

    Sekine, Shigeyuki; Shimizu, Hazime; Ichimura, Singo

    1995-04-01

    Polycrystalline CuNi alloys were sputtered by 3 kV Xe + ions at elevated temperatures to analyze the ion-beam-induced diffusion. The time evolution of the composition of the sputtered materials from the start of the sputtering was measured by TOF-SNMS (time-of-flight sputtered neutral mass spectrometry). During removal of the Gibbsian segregation layer of copper, the sputtered flux consisted of almost only copper atoms. Then, the copper content gradually decreased due to the formation of a sputter-induced copper-depleted surface layer, and reached an almost steady state with still higher copper content than the bulk composition. From the temperature dependence of the composition at the quasi-steady state the activation energy of copper transportation through a high diffusivity path was derived to be 54 kJ mol -1 (0.56 eV). The high diffusivity path was assigned to copper diffusion through grain boundaries.

  13. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  14. High-brightness electron injectors

    International Nuclear Information System (INIS)

    Free-electron laser (FEL) oscillators and synchrotron light sources require pulse trains of high peak brightness and, in some applications, high-average power. Recent developments in the technology of photoemissive and thermionic electron sources in rf cavities for electron-linac injector applications offer promising advances over conventional electron injectors. Reduced emittance growth in high peak-current electron injectors may be achieved by using high field strengths and by linearizing the radial component of the cavity electric field at the expense of lower shunt impedance

  15. High brightness beams and applications

    International Nuclear Information System (INIS)

    This paper describes the present research on attaining intense bright electron beams. Thermionic systems are briefly covered. Recent and past results from the photoinjector programs are given. The performance advantages and difficulties presently faced by researchers using photoinjectors is discussed. The progress that has been made in photocathode materials, both in lifetime and quantum efficiency, is covered. Finally, a discussion of emittance measurements of photoinjector systems and how the measurement is complicated by the non-thermal nature of the electron beam is presented

  16. Analysis of sputtering from a TiC coated test limiter in the Tokamak de Varennes

    International Nuclear Information System (INIS)

    An assembly which allows insertion of a test-limiter into a hot plasma has been developed. In addition to its usefulness in the study of various materials, it is also well adapted for measuring the properties of the edge plasma. Measurements of sputtering and power deposition can be used to determine unique values for the plasma density and temperature. In addition, the fluctuations of the radiation from the edge have shown very regular 'sawteeth', which we have correlated with other diagnostics. These display a surprising phase inversion near the edge

  17. Brightness limitations in multi-kiloampere electron beam sources

    International Nuclear Information System (INIS)

    Heuristic relationships such as the Lawson-Penner criterion, used to scale Free Electron Laser (FEL) amplifier gain and efficiency over orders of magnitude in beam current and brightness, have no fundamental basis. The brightness of a given source is set by practical design choices such as peak voltage, cathode type, gun electrode geometry, and focusing field topology. The design of low emittance, high current electron guns has received considerable attention at Livermore over the past few years. The measured brightnesses of the Experimental Test Accelerator (ETA) and Advanced Test Accelerator (ATA) guns are less than predicted with the EBQ gun design code; this discrepancy is due to plasma effects from the present cold, plasma cathode in the code. The EBQ code is well suited to exploring the current limits of gridless relativistic Pierce columns with moderate current density (2) at the cathode. As EBQ uses a steady-state calculation it is not amenable for study of transient phenomena at the beam head. For this purpose, a Darwin approximation code, DPC, has been written. The main component in our experimental cathode development effort is a readily modified electron gun that will allow us to test many candidate cathode materials, types and electrode geometries at field stresses up to 1 MV/cm. 6 references, 6 figures

  18. Chemically enhanced self-sputtering of carbon

    International Nuclear Information System (INIS)

    New results obtained for graphite self-sputtering, in the presence of thermal atomic hydrogen, show that Chemically Enhanced Self-Sputtering (CES) can exceed unity erosion yield even at normal angles of incidence. CES yields were found to depend on the ΦC+/ΦHo flux ratio and graphite temperature, with peak erosion occurring at about 800K. No dependence on angle of incidence was observed

  19. Sputtering of sodium on the planet Mercury

    Science.gov (United States)

    Mcgrath, M. A.; Johnson, R. E.; Lanzerotti, L. J.

    1986-01-01

    It is shown here that ion sputtering cannot account for the observed neutral sodium vapor column density on Mercury, but that it is an important loss mechanism for Na. Photons are likely to be the dominant stimulus, both directly through photodesorption and indirectly through thermal desorption of absorbed Na. It is concluded that the atmosphere produced is characterized by the planet's surface temperature, with the ion-sputtered Na contributing to a lesser, but more extended, component of the atmosphere.

  20. The Bright New Financial System

    Directory of Open Access Journals (Sweden)

    Associate Professor Adela Coman

    2009-05-01

    Full Text Available By the end of 2008, Mr. Paul Volcker gave financiers a devastating critique. “For all its talented participants, for all its rich rewards” he said, the “bright new financial system” has “failed the test of the marketplace”.In light of the events of recent weeks, it is hard to disagree. A financial system that ends up with the government taking over some of its biggest institutions in serial weekend rescues and which requires the promise of 700 billion dollars in public money to stave off catastrophe is not a trustworthy system. The disappearance of all five big American investment banks – either by bankruptcy or rebirth as commercial banks – is powerful evidence that Wall Street failed “the test of the marketplace”. Something went wrong.But what exactly and why? A more serious analysis needs to distinguish between three separate questions: what is Mr. Volcker’s “bright new financial system”? Second, how far was today’s mess created by instabilities that are inseparable from modern finance and how far was it fuelled by other errors and distortions? Third, to the extent that modern finance does bear the blame, what is the balance between its costs and its benefits and how can it be improved?

  1. DEPOSITION OF NIOBIUM AND OTHER SUPERCONDUCTING MATERIALS WITH HIGH POWER IMPULSE MAGNETRON SPUTTERING: CONCEPT AND FIRST RESULTS

    Energy Technology Data Exchange (ETDEWEB)

    High Current Electronics Institute, Tomsk, Russia; Anders, Andre; Mendelsberg, Rueben J.; Lim, Sunnie; Mentink, Matthijs; Slack, Jonathan L.; Wallig, Joseph G.; Nollau, Alexander V.; Yushkov, Georgy Yu.

    2011-07-24

    Niobium coatings on copper cavities have been considered as a cost-efficient replacement of bulk niobium RF cavities, however, coatings made by magnetron sputtering have not quite lived up to high expectations due to Q-slope and other issues. High power impulse magnetron sputtering (HIPIMS) is a promising emerging coatings technology which combines magnetron sputtering with a pulsed power approach. The magnetron is turned into a metal plasma source by using very high peak power density of ~ 1 kW/cm{sup 2}. In this contribution, the cavity coatings concept with HIPIMS is explained. A system with two cylindrical, movable magnetrons was set up with custom magnetrons small enough to be inserted into 1.3 GHz cavities. Preliminary data on niobium HIPIMS plasma and the resulting coatings are presented. The HIPIMS approach has the potential to be extended to film systems beyond niobium, including other superconducting materials and/or multilayer systems.

  2. Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

    Energy Technology Data Exchange (ETDEWEB)

    Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

    2010-07-01

    The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

  3. High Brightness Neutron Source for Radiography

    Energy Technology Data Exchange (ETDEWEB)

    Cremer, J. T.; Piestrup, Melvin, A.; Gary, Charles, K.; Harris, Jack, L. Williams, David, J.; Jones, Glenn, E.; Vainionpaa, J. , H.; Fuller, Michael, J.; Rothbart, George, H.; Kwan, J., W.; Ludewigt, B., A.; Gough, R.., A..; Reijonen, Jani; Leung, Ka-Ngo

    2008-12-08

    This research and development program was designed to improve nondestructive evaluation of large mechanical objects by providing both fast and thermal neutron sources for radiography. Neutron radiography permits inspection inside objects that x-rays cannot penetrate and permits imaging of corrosion and cracks in low-density materials. Discovering of fatigue cracks and corrosion in piping without the necessity of insulation removal is possible. Neutron radiography sources can provide for the nondestructive testing interests of commercial and military aircraft, public utilities and petrochemical organizations. Three neutron prototype neutron generators were designed and fabricated based on original research done at the Lawrence Berkeley National Laboratory (LBNL). The research and development of these generators was successfully continued by LBNL and Adelphi Technology Inc. under this STTR. The original design goals of high neutron yield and generator robustness have been achieved, using new technology developed under this grant. In one prototype generator, the fast neutron yield and brightness was roughly 10 times larger than previously marketed neutron generators using the same deuterium-deuterium reaction. In another generator, we integrate a moderator with a fast neutron source, resulting in a high brightness thermal neutron generator. The moderator acts as both conventional moderator and mechanical and electrical support structure for the generator and effectively mimics a nuclear reactor. In addition to the new prototype generators, an entirely new plasma ion source for neutron production was developed. First developed by LBNL, this source uses a spiral antenna to more efficiently couple the RF radiation into the plasma, reducing the required gas pressure so that the generator head can be completely sealed, permitting the possible use of tritium gas. This also permits the generator to use the deuterium-tritium reaction to produce 14-MeV neutrons with increases

  4. Laser sputtering of highly oriented pyrolytic graphite at 248 nm

    Science.gov (United States)

    Krajnovich, Douglas J.

    1995-01-01

    The interaction of excimer laser pulses with a highly oriented pyrolytic graphite (HOPG) target has been studied. HOPG, a close approximation to single crystal graphite, was irradiated along a freshly cleaved basal plane in vacuum by pulses from a KrF excimer laser. The energy fluence was varied between 300-700 mJ/cm2, resulting in material removal rates of plasma effects are minimized. Time-of-flight distributions of the neutral carbon atoms and small carbon clusters were measured and inverted to obtain translational energy flux distributions and relative sputtering yields as a function of fluence. The translational energy distributions are remarkably close to Maxwell-Boltzmann distributions over most of the fluence range studied. However, the mean translational energies are far too high to reconcile with a simple thermal vaporization model. For example, the mean translational energy of C3, the most abundant species, increases from 1.1 eV at 305 mJ/cm2 to 31.7 eV at 715 mJ/cm2. Explanations are considered for this curious mix of thermal and non-thermal behavior. At the high end of our fluence range, the mean translational energies of C1, C2, C3 converge to a 1:2:3 ratio, indicating that the velocity distributions are almost identical. This particular result can be interpreted as a gas dynamic effect. Prolonged sputtering of the same target spot results in a falloff in the sputtering yield and the mean translational energies, but little change in the cluster size distribution. These effects are related to impurity induced topography formation on the target surface.

  5. Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses

    International Nuclear Information System (INIS)

    Model studies of 400 µs long discharge pulses in high-power impulse magnetron sputtering have been made to study the gas dynamics and plasma chemistry in this type of pulsed processing plasma. Data are taken from an experiment using square voltage pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The study is limited to low power densities, −2, in which the discharge is far away from the runaway self-sputtering mode. The model used is the ionization region model, a time-dependent plasma chemistry discharge model developed for the ionization region in magnetron sputtering discharges. It gives a close fit to the discharge current during the whole pulse, both an initial high-current transient and a later plateau value of constant lower current. The discharge current peak is found to precede a maximum in gas rarefaction of the order of ΔnAr/nAr,0 ≈ 50%. The time durations of the high-current transient, and of the rarefaction maximum, are determined by the time it takes to establish a steady-state diffusional refill of process gas from the surrounding volume. The dominating mechanism for gas rarefaction is ionization losses, with only about 30% due to the sputter wind kick-out process. During the high-current transient, the degree of sputtered metal ionization reaches 65–75%, and then drops to 30–35% in the plateau phase. The degree of self-sputtering (defined here as the metal ion fraction of the total ion current to the target) also varies during the pulse. It grows from zero at pulse start to a maximum of 65–70% coinciding in time with the maximum gas rarefaction, and then stabilizes in the range 40–45% during the plateau phase. The loss in deposition rate that can be attributed to the back-attraction of the ionized sputtered species is also estimated from the model. It is low during the initial 10–20 µs, peaks around 60% during the high-current transient, and finally stabilizes around 30% during the plateau phase. (paper)

  6. Sputtered film thermistor IR detectors

    Science.gov (United States)

    Baliga, Shankar B.; Rost, Martin R.; Doctor, Alan P.

    1994-07-01

    The thermistor infrared detector or bolometer is the detector of choice in many classical remote sensing applications such as horizon sensing, noncontact thermometry, and industrial applications. In recent years, the authors have developed a thin film process where the thermistor material is deposited from a target directly onto the substrate. This is an advance over the labor intensive ceramic technology, where sintered flakes of the thermistor are bonded to the substrate. The thin film technique permits a variety of device constructions and configurations. Detectors fabricated on heat-sunk ceramic substrates can withstand high operating temperatures and large incident optical power, in both pulsed and CW laser measurements. For dc or low frequency measurements, the films can be deposited onto a thermally isolated membrane with applications in motion sensing, gas detection, and temperature measurement. Utilizing advances in micromachining a 2D array of thermally isolated microbolometer sensors, integrated onto a silicon wafer containing readout circuitry may be achieved. This paper describes the construction of the sputtered film thermistor detectors, their operation, and applications.

  7. How Bright Can Supernovae Get?

    Science.gov (United States)

    Kohler, Susanna

    2016-04-01

    Supernovae enormous explosions associated with the end of a stars life come in a variety of types with different origins. A new study has examined how the brightest supernovae in the Universe are produced, and what limits might be set on their brightness.Ultra-Luminous ObservationsRecent observations have revealed many ultra-luminous supernovae, which haveenergies that challenge our abilities to explain them usingcurrent supernova models. An especially extreme example is the 2015 discovery of the supernova ASASSN-15lh, which shone with a peak luminosity of ~2*1045 erg/s, nearly a trillion times brighter than the Sun. ASASSN-15lh radiated a whopping ~2*1052 erg in the first four months after its detection.How could a supernova that bright be produced? To explore the answer to that question, Tuguldur Sukhbold and Stan Woosley at University of California, Santa Cruz, have examined the different sources that could produce supernovae and calculated upper limits on the potential luminosities ofeach of these supernova varieties.Explosive ModelsSukhbold and Woosley explore multiple different models for core-collapse supernova explosions, including:Prompt explosionA stars core collapses and immediately explodes.Pair instabilityElectron/positron pair production at a massive stars center leads to core collapse. For high masses, radioactivity can contribute to delayed energy output.Colliding shellsPreviously expelled shells of material around a star collide after the initial explosion, providing additional energy release.MagnetarThe collapsing star forms a magnetar a rapidly rotating neutron star with an incredibly strong magnetic field at its core, which then dumps energy into the supernova ejecta, further brightening the explosion.They then apply these models to different types of stars.Setting the LimitThe authors show that the light curve of ASASSN-15lh (plotted in orange) can be described by a model (black curve) in which a magnetar with an initial spin period of 0.7 ms

  8. [Bright light therapy for elderly].

    Science.gov (United States)

    Okawa, Masako

    2015-06-01

    Bright light therapy (BLT) holds considerable promise for sleep problems in the elderly. BLT for community-dwelling patients with Alzheimer's disease showed significant improvement in sleep parameters. In the institutional setting, BLT was effective in reducing daytime nap duration. Morning BLT was found to advance the peak circadian rhythm and increase activity level in daytime and melatonin level at night. Light therapy could be used in combination with other nonpharmacological methods such as social activities, outside walking, physical exercises, which showed greater effects than independent BLT on sleep and cognitive function. BLT treatment strategy was proposed in the present paper. We should pay more attentions to BLT in community setting for mental and physical well-being. PMID:26065132

  9. Protective infrared antireflection coating based on sputtered germanium carbide

    Science.gov (United States)

    Gibson, Des; Waddell, Ewan; Placido, Frank

    2011-09-01

    This paper describes optical, durablility and environmental performance of a germanium carbide based durable antireflection coating. The coating has been demonstrated on germanium and zinc selenide infra-red material however is applicable to other materials such as zinc sulphide. The material is deposited using a novel reactive closed field magnetron sputtering technique, offering significant advantages over conventional evaporation processes for germanium carbide such as plasma enhanced chemical vapour deposition. The sputtering process is "cold", making it suitable for use on a wide range of substrates. Moreover, the drum format provide more efficient loading for high throughput production. The use of the closed field and unbalanced magnetrons creates a magnetic confinement that extends the electron mean free path leading to high ion current densities. The combination of high current densities with ion energies in the range ~30eV creates optimum thin film growth conditions. As a result the films are dense, spectrally stable, supersmooth and low stress. Films incorporate low hydrogen content resulting in minimal C-H absorption bands within critical infra-red passbands such as 3 to 5um and 8 to 12um. Tuning of germanium carbide (Ge(1-x)Cx) film refractive index from pure germanium (refractive index 4) to pure germanium carbide (refractive index 1.8) will be demonstrated. Use of film grading to achieve single and dual band anti-reflection performance will be shown. Environmental and durability levels are shown to be suitable for use in harsh external environments.

  10. Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

    Directory of Open Access Journals (Sweden)

    Bogdanov R.V.

    2015-03-01

    Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

  11. Ion beam sputtering of Ag – Angular and energetic distributions of sputtered and scattered particles

    Energy Technology Data Exchange (ETDEWEB)

    Feder, René, E-mail: rene.feder@iom-leipzig.de; Bundesmann, Carsten; Neumann, Horst; Rauschenbach, Bernd

    2013-12-01

    Ion beam sputter deposition (IBD) provides intrinsic features which influence the properties of the growing film, because ion properties and geometrical process conditions generate different energy and spatial distribution of the sputtered and scattered particles. A vacuum deposition chamber is set up to measure the energy and spatial distribution of secondary particles produced by ion beam sputtering of different target materials under variation of geometrical parameters (incidence angle of primary ions and emission angle of secondary particles) and of primary ion beam parameters (ion species and energies). A representative set of Ag thin films is deposited arranged on a substrate holder equatorial to the Ag target in steps of 10° and characterized concerning their film thickness by profilometry to determine the angular distribution of the sputtered particles. The film thickness distributions show a tilted, cosine-like shape and a shifting of the maximum position depending on the primary particle energy and incidence angle of the primary ions. The energy distributions of sputtered and scattered ions and of sputtered neutrals are measured with an energy-selective mass spectrometer. The average energy of the sputtered ions increases with increasing emission angle and also increases with increasing incidence angle of the primary ions. In contrast, the average energy of the sputtered ions is nearly unaffected by the primary particle energy and particle species. The energy distribution of the scattered Ar ions reveals high energetic maxima which shift with increasing emission angle to higher energies. These maxima are not observed for Xe bombardment. The total energies of sputtered and scattered ions show significant differences between the two bombarding species. The maximum of the energy distribution of sputtered Ag neutrals is used to conclude on the surface binding energy of Ag (2.72 eV). All experimental data are compared with Monte Carlo simulations done with

  12. Quantum communication with macroscopically bright nonclassical states.

    Science.gov (United States)

    Usenko, Vladyslav C; Ruppert, Laszlo; Filip, Radim

    2015-11-30

    We analyze homodyne detection of macroscopically bright multimode nonclassical states of light and propose their application in quantum communication. We observe that the homodyne detection is sensitive to a mode-matching of the bright light to the highly intense local oscillator. Unmatched bright modes of light result in additional noise which technically limits detection of Gaussian entanglement at macroscopic level. When the mode-matching is sufficient, we show that multimode quantum key distribution with bright beams is feasible. It finally merges the quantum communication with classical optical technology of visible beams of light. PMID:26698776

  13. 溅射沉积氢化非晶硅中辉光放电等离子体的Langmuir探针诊断%Diagnosis of Glow Discharge Plasma with Langmuir Probe in Growth of Magnetron Sputtered a-Si:H Film

    Institute of Scientific and Technical Information of China (English)

    李洪涛; 蒋百灵; 杨波; 曹政; 郭维华; 焦栋茂

    2011-01-01

    为揭示磁控溅射辉光放电等离子体参量对Si薄膜沉积过程的本质影响,采用Langmuir探针于不同的靶电流、靶基距和氢分压条件下对直流辉光放电等离子体进行了诊断,分析了直流辉光放电等离子体参量(离子密度、离子流通量、等离子体电势、电子密度、电子温度)的变化规律,并以此为依据探讨了其对Si靶溅射过程和溅射Si粒子输运过程的影响.结果表明:不同靶电流下,距靶面3cm处等离子体参量中离子密度、离子流通量和电子密度均随靶电流的增大而增大;靶电流为0.5A时,在靶基距从4cm增大至21 cm过程中,离子密度和离子流通量先增大后减小,均在9cm处出现峰值;靶基距恒为12 cm 时,随氢气流量的增大,离子密度和离子流通量均增大(除氢气流量为45 ml/nin(标准状态)时有所下降).上述各参数下电子温度的变化波动性较大,但电子能量均在1~5eV,即高能电子所占比例极小.%The amorphous hydrogenated silicon films (a-Si: H) were deposited by plasma enhanced DC magnetron sputtering. The impacts of the growth conditions, such as the target current, hydrogen partial pressure, target-substrate separation, and plasma enhancement, on microstructures and quality of the films were studied.The characteristics of the glow discharge plasma,including the ion density and flux,plasma potential distribution,electron density and temperature, were in-situ evaluated with Langmuir probe.The results show that at a target-substrate separation of 3 cm,the ion density,ion flux and electron density increase with an increase of the target current; at a target current of 0.5 A,as the separation increases from 4 cm to 21 cm, both the ion density and flux rise up, and then drops down, peaking at the separation of 9 cm;at 12 cm,as the hydrogen flow rate increases, the ion density and flux increase. Except few high energy electrons, most electrons have energies ranging from 1 eV to 5

  14. Deuterium Retention and Physical Sputtering of Low Activation Ferritic Steel

    Institute of Scientific and Technical Information of China (English)

    T. Hino; K. Yamaguchi; Y. Yamauchi; Y. Hirohata; K. Tsuzuki; Y.Kusama

    2005-01-01

    Low activation materials have to be developed toward fusion demonstration reactors. Ferritic steel, vanadium alloy and SiC/SiC composite are candidate materials of the first wall,vacuum vessel and blanket components, respectively. Although changes of mechanical-thermal properties owing to neutron irradiation have been investigated so far, there is little data for the plasma material interactions, such as fuel hydrogen retention and erosion. In the present study,deuterium retention and physical sputtering of low activation ferritic steel, F82H, were investigated by using deuterium ion irradiation apparatus.After a ferritic steel sample was irradiated by 1.7 kev D+ ions, the weight loss was measured to obtain the physical sputtering yield. The sputtering yield was 0.04, comparable to that of stainless steel. In order to obtain the retained amount of deuterium, technique of thermal desorption spectroscopy (TDS) was employed to the irradiated sample. The retained deuterium desorbed at temperature ranging from 450 K to 700 K, in the forms of DHO, D2, D2O and hydrocarbons. Hence, the deuterium retained can be reduced by baking with a relatively low temperature. The fluence dependence of retained amount of deuterium was measured by changing the ion fluence. In the ferritic steel without mechanical polish, the retained amount was large even when the fluence was low. In such a case, a large amount of deuterium was trapped in the surface oxide layer containing O and C. When the fluence was large, the thickness of surface oxide layer was reduced by the ion sputtering, and then the retained amount in the oxide layer decreased. In the case of a high fluence, the retained amount of deuterium became comparable to that of ferritic steel with mechanical polish or SS 316 L, and one order of magnitude smaller than that of graphite. When the ferritic steel is used, it is required to remove the surface oxide layer for reduction of fuel hydrogen retention.Ferritic steel sample was

  15. Tailoring of antibacterial Ag nanostructures on TiO2 nanotube layers by magnetron sputtering.

    Science.gov (United States)

    Uhm, Soo-Hyuk; Song, Doo-Hoon; Kwon, Jae-Sung; Lee, Sang-Bae; Han, Jeon-Geon; Kim, Kyoung-Nam

    2014-04-01

    To reduce the incidence of postsurgical bacterial infection that may cause implantation failure at the implant-bone interface, surface treatment of titanium implants with antibiotic materials such as silver (Ag) has been proposed. The purpose of this work was to create TiO2 nanotubes using plasma electrolytic oxidation (PEO), followed by formation of an antibacterial Ag nanostructure coating on the TiO2 nanotube layer using a magnetron sputtering system. PEO was performed on commercially pure Ti sheets. The Ag nanostructure was added onto the resulting TiO2 nanotube using magnetron sputtering at varying deposition rates. Field emission scanning electron microscopy and transmission electron microscopy were used to characterize the surface, and Ag content on the TiO2 nanotube layer was analyzed by X-ray diffraction and X-ray photoelectron spectroscopy. Scanning probe microscopy for surface roughness and contact angle measurement were used to indirectly confirm enhanced TiO2 nanotube hydrophilicity. Antibacterial activity of Ag ions in solution was determined by inductively coupled plasma mass spectrometry and antibacterial testing against Staphylococcus aureus (S. aureus). In vitro, TiO2 nanotubes coated with sputtered Ag resulted in significantly reduced S. aureus. Cell viability assays showed no toxicity for the lowest sputtering time group in the osteoblastic cell line MC3T3-E1. These results suggest that a multinanostructured layer with a biocompatible TiO2 nanotube and antimicrobial Ag coating is a promising biomaterial that can be tailored with magnetron sputtering for optimal performance.

  16. Magnetron sputtered lithium niobate films

    International Nuclear Information System (INIS)

    The preparation of lithium niobate films on Corning 7059 glass by rf planar magnetron sputtering in an Ar + 40% 02 mixture has been studied at 2 mtorr. Films deposited on unheated substrates became crazed by release of a tensile stress arising from the difference between the expansion coefficient of the glass and the coating. Improvement of surface cleanliness by discharge cleaning or solvent degreasing using iso-propyl alcohol in a Soxhlet extractor enhanced the film/substrate adhesion. This prevented crazing, but the transparent films produced were still under stress. Glass surfaces cleaned sufficiently for high film adhesion had a coefficient of static friction, glass on glass, of greater than of the order of 0.8. A lithium niobate powder target was used because the uneven heating arising from magnetron discharge localization resulted in fracture of single crystal material. Care was taken to remove all water vapour from the discharge atmosphere using liquid nitrogen traps, for without these the coatings produced were optically absorbing, due to oxide reduction, presumably formed by an active hydrogen reaction. The refractive index of the films, as determined from their waveguiding characteristics, was in the region of 2.10-2.20. Trial coatings grown at 380degC and above had indices in the region of 2.19; these high temperature films were also transparent but under tensile stress. The growth rates ranged from 9.5 A min-1 for a substrate temperature of 3800C to 11.5 A min-1 for a substrate temperature of 4700C. (author)

  17. Thin films preparation of the Ti-Al-O system by rf-sputtering;Preparacion de peliculas delgadas del sistema Ti-Al-O mediante rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J. [IPN, Centro de Investigacion en Ciencia Aplicada y Tecnologia Avanzada, Unidad Altamira, Km 14.5 Carretera Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas (Mexico); Manaud, J. P.; Lahaye, M. [Centre National de la Recherche Scientifique, Institut de Chimie de la Matiere Condensee, Universite Bordeaux I, 87, Av. du Dr. Schweitzer, F-33608 Pessac-Cedex (France); Munoz S, J., E-mail: jmontedeocacv@ipn.m [IPN, Centro de Investigacion y de Estudios Avanzados, Unidad Queretaro, Libramiento Norponiente No. 2000, Fracc. Real de Juriquilla, 76230 Santiago de Queretaro, Qro. (Mexico)

    2010-07-01

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti{sub 3}Al targets in a sputtering chamber with an Ar-O{sub 2} atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  18. Nylon-sputtered nanoparticles: fabrication and basic properties

    Science.gov (United States)

    Polonskyi, O.; Kylián, O.; Solař, P.; Artemenko, A.; Kousal, J.; Slavínská, D.; Choukourov, A.; Biederman, H.

    2012-12-01

    Nylon-sputtered nanoparticles were prepared using a simple gas aggregation cluster source based on a planar magnetron (Haberland type) and equipped with a nylon target. Plasma polymer particles originated in an aggregation chamber and travelled to a main (deposition) chamber with a gas flow through an orifice. The deposited nanoparticles were observed to have a cauliflower-like structure. The nanoparticles were found to be nitrogen-rich with N/C ratio close to 0.5. An increase in rf power from 60 to 100 W resulted in a decrease in mean particle size from 210 to 168 nm whereas an increase in their residence time in the cluster source from 0.7 to 4.6 s resulted in an increase in the size from 73 to 231 nm.

  19. Molecular dynamics simulation of gold cluster growth during sputter deposition

    Science.gov (United States)

    Abraham, J. W.; Strunskus, T.; Faupel, F.; Bonitz, M.

    2016-05-01

    We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.

  20. Sputtering and mixing of supported nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física y Química Aplicadas a la Técnica Aeronaútica, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III (Electricidad y Electrónica), Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2013-12-01

    Sputtering and mixing of Co nanoparticles supported in Cu(0 0 1) under 1-keV argon bombardment are studied using molecular-dynamics simulations. Particles of different initial size have been considered. The cluster height decreases exponentially with increasing fluence. In nanoparticles, sputtering yield is significantly enhanced compared to bulk. In fact, the value of this magnitude depends on the cluster height. A theoretical model for sputtering is introduced with acceptable results compared to those obtained by simulation. Discrepancies happen mainly for very small particles. Mixing rate at the interface is quantified; and besides, the influence of border effects for clusters of different initial size is assessed. Mixing rate and border length–surface area ratio for the initial interface show a proportionality relation. The phenomenon of ion-induced burrowing of metallic nanoparticles is analysed.

  1. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  2. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  3. Soliton fay identities: II. Bright soliton case

    International Nuclear Information System (INIS)

    We present a set of bilinear matrix identities that generalize the ones that have been used to construct the bright soliton solutions for various models. As an example of an application of these identities, we present a simple derivation of the N-bright soliton solutions for the Ablowitz–Ladik hierarchy. (paper)

  4. Spatial Brightness Perception of Trichromatic Stimuli

    Energy Technology Data Exchange (ETDEWEB)

    Royer, Michael P.; Houser, Kevin W.

    2012-11-16

    An experiment was conducted to examine the effect of tuning optical radiation on brightness perception for younger (18-25 years of age) and older (50 years of age or older) observers. Participants made forced-choice evaluations of the brightness of a full factorial of stimulus pairs selected from two groups of four metameric stimuli. The large-field stimuli were created by systematically varying either the red or the blue primary of an RGB LED mixture. The results indicate that light stimuli of equal illuminance and chromaticity do not appear equally bright to either younger or older subjects. The rank-order of brightness is not predicted by any current model of human vision or theory of brightness perception including Scotopic to Photopic or Cirtopic to Photopic ratio theory, prime color theory, correlated color temperature, V(λ)-based photometry, color quality metrics, linear brightness models, or color appearance models. Age may affect brightness perception when short-wavelength primaries are used, especially those with a peak wavelength shorter than 450 nm. The results suggest further development of metrics to predict brightness perception is warranted, and that including age as a variable in predictive models may be valuable.

  5. SURFACE PHOTOMETRY OF LOW SURFACE BRIGHTNESS GALAXIES

    NARCIS (Netherlands)

    DEBLOK, WJG; VANDERHULST, JM; BOTHUN, GD

    1995-01-01

    Low surface brightness (LSB) galaxies are galaxies dominated by an exponential disc whose central surface brightness is much fainter than the value of mu(B)(0) = 21.65 +/- 0.30 mag arcsec(-2) found by Freeman. In this paper we present broadband photometry of a sample of 21 late-type LSB galaxies. Th

  6. Brightness and darkness as perceptual dimensions

    NARCIS (Netherlands)

    Vladusich, T.; Lucassen, M.P.; Cornelissen, F.W.

    2007-01-01

    A common-sense assumption concerning visual perception states that brightness and darkness cannot coexist at a given spatial location. One corollary of this assumption is that achromatic colors, or perceived grey shades, are contained in a one-dimensional (1-D) space varying from bright to dark. The

  7. Incoherently coupled dark-bright photorefractive solitons

    Science.gov (United States)

    Chen, Zhigang; Segev, Mordechai; Coskun, Tamer H.; Christodoulides, Demetrios N.; Kivshar, Yuri S.; Afanasjev, Vsevolod V.

    1996-11-01

    We report the observation of incoherently coupled dark-bright spatial soliton pairs in a biased bulk photorefractive crystal. When such a pair is decoupled, the dark component evolves into a triplet structure, whereas the bright one decays into a self-defocusing beam.

  8. Brightness Alteration with Interweaving Contours

    Directory of Open Access Journals (Sweden)

    Sergio Roncato

    2012-12-01

    Full Text Available Chromatic induction is observed whenever the perceived colour of a target surface shifts towards the hue of a neighbouring surface. Some vivid manifestations may be seen in a white background where thin coloured lines have been drawn (assimilation or when lines of different colours are collinear (neon effect or adjacent (watercolour to each other. This study examines a particular colour induction that manifests in concomitance with an opposite effect of colour saturation (or anti-spread. The two phenomena can be observed when a repetitive pattern is drawn in which outline thin contours intercept wider contours or surfaces, colour spreading appear to fill the surface occupied by surfaces or thick lines whereas the background traversed by thin lines is seen as brighter or filled of a saturated white. These phenomena were first observed by Bozzi (1975 and Kanizsa (1979 in figural conditions that did not allow them to document their conjunction. Here we illustrate various manifestations of this twofold phenomenon and compare its effects with the known effects of brightness and colour induction. Some conjectures on the nature of these effects are discussed.

  9. The sputter generation of negative ion beams

    International Nuclear Information System (INIS)

    A brief review is given of recent progress toward a quantitative understanding of negative ion formation by sputtering from surfaces covered with fractional layers of highly electropositive adsorbates. Practical models developed for estimating changes in work functions Δφ by electropositive adsorbates are described. The secondary negative ion generation process is examined through the use of composite energy/velocity dependent analytical models. These models are used to illustrate the effect of work function on the energy distributions of negative ions sputter ejected from a polycrystalline molybdenum surface covered with fractional layers of cesium. Predictions are also made of the functional dependence of the probability for negative ion formation on cesium coverage. The models predict energy distributions which are in basic disagreement with experimental observations, implying their inappropriateness for describing the sputter negative ion generation process. We have also developed a model for calculating sputter ratios based on the use of simple scaling procedures to bring Sigmund theory into close agreement with experimental observation accounting for the threshold effect. Scaling factors for projectile energies E > 1000 eV are found to be independent of energy while those for projectile energies Eth < E < 1000 eV were found to be energy dependent. In this study, the model and scaling techniques utilized to bring Sigmund theory into agreement with experiment are discussed in detail and several examples provided which illustrate the versatility, accuracy and utility of the model. In the present report, we describe the model and apply it to the case of sputtering a selected number of metals with energetic cesium ions. In particular, we present sputter ratio information for a number of Cs-projectile/metal-target combinations; the targets are bombarded at normal incidence to the surface

  10. Surface analysis by glow discharge spectrometry: cathode zone and sputtering yield

    International Nuclear Information System (INIS)

    Applications of the glow discharge optical spectroscopy for surface analysis are numerous. Moreover, this method enables to get qualitative and semi-quantitative results which are already significant. However, we should improve our knowledge of the physical parameters involved in the glow discharge lamp mechanisms and learn to handle such phenomena. The problems can be divided into two categories: sputtering of the target under argon ions accelerated in the cathode dark space, and luminous emission of torn away species which reach the negative glow region. Our aim was to take stock of the present theoretical knowledge which can be applied to the specific self-maintained glow discharge plasma. Moreover, we tried to link together (often roughly) the basic discharge parameters, i.e. current intensity I, voltage of the lamp Vg, pressure of the gas p. Specially a comparison between theoretical and experimental results was established concerning the pure target sputtering yields. The contribution of the argon ions striking the cathode is estimated taking into account their energetic distribution. The role of the fast argon neutrals produced by charge exchange with the ions is important; we evaluated their energetic distribution and their contribution to sputtering. The total theoretical sputtering yield is inferred: the comparison with experimental results is presented. The role of the gas temperature is emphasized

  11. Experimental investigation of the energy and temperature dependence of beryllium self sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Korshunov, S.N.; Guseva, M.I.; Stolijarova, V.G. [RRC Kurchatov Institute, Moscow (Russian Federation)

    1995-09-01

    The low-Z metal beryllium is considered as plasma facing material (PFM) for the ITER. It is expected that operation temperature range of beryllium PFM will be (670 - 1070) K. While experimental Be-sputtering data bases exist for H{sup +}, D{sup +} and He{sup +}-ions, the self-sputtering yields of Be have only been estimated by computer simulation. In this paper we report the experimental results on the energy and temperature dependence of the beryllium self-sputtering yield (S). The energy dependence of S{sup s} in the energy range (0.5 - 10.0) keV was measured at 670 K. The self-sputtering yield of Be attains its maximal value at the ion energy of 1.5 keV, being equal to 0.32 {+-} at./ion. Comparison of the experimental results and theoretical prediction shows a good agreement for energy dependence of S{sup s}. The temperature dependence of S{sup s} in the temperature range (370-1070)K was obtained for 0.9keV Be{sup +}-ions. The value of S{sup s} is not changed up to 870 K. It sharply increases at the temperatures above 870 attaining the value of 0.75 at./ion at 1070 K.

  12. Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods.Unbalanced magnetron sputtering,by producing dense secondary plasma around the substrate,provides a high ion current density.The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal,alloy,and ceramic thin films.The key factor in the CFUBMS system is the ability to transport high ion currents to the substrate,which can enhance the formation of full dense coatings at relatively low value homologous temperature.The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes.Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.

  13. Characterization of Hydroxyapatite Film on Titanium Substrate by Sputtering Technique

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Radiofrequent magnetron sputtering technique was used to produce calcium phosphate coated on the titanium substrates, and the sputtered coating films were crystallized in an autoclave at 110 ℃ using a low temperature hydrothermal technique. The crystallization of as- sputtered coating film on the titanium substrates were amorphous calcium phosphate film. However, after the hydrothermal technique, calcium phosphate crystals grew and these were columnar crystal. The Ca/ P ratio of sputtered coating films in 1.6 to 2.0.

  14. Qualitative criterion for atom sputtering angle distributions

    International Nuclear Information System (INIS)

    A model is introduced to explain the shape of atom polar emission angle distributions for monocomponent targets sputtered by normally incident keV - energy ions. Analytical expressions are obtained from the model which make it possible to identify three known kinds of the angle distributions - subcosinus, isotropic and supracosinus, for given ion energies and target-ion pairs. Furthermore the fourth, hybrid false-isotropic distribution is found, which is superposition of supracosinus and subcosinus distributions. The theoretical predictions of the angle distributions shape agree with the numerical modeling for sputtering of carbon and platinum by 0.1-10 keV Ar+ ions

  15. Collimated Magnetron Sputter Deposition for Mirror Coatings

    DEFF Research Database (Denmark)

    Vickery, A.; Cooper-Jensen, Carsten P.; Christensen, Finn Erland;

    2008-01-01

    At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence...... that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively....

  16. On the formation of Ganymede's surface brightness asymmetries: Kinetic simulations of Ganymede's magnetosphere

    Science.gov (United States)

    Fatemi, S.; Poppe, A. R.; Khurana, K. K.; Holmström, M.; Delory, G. T.

    2016-05-01

    Ganymede possesses strong surface brightness asymmetries both between its polar cap and equatorial regions and between its leading and trailing hemispheres. Here we test the hypothesis that these asymmetries are due to differential Jovian plasma and energetic particle precipitation to the surface with the combination of a hybrid plasma model (kinetic ions and fluid electrons) and a particle tracing model. We describe the hybrid model, the first of its kind applied to Ganymede, and compare the results to both Galileo observations and previous MHD and MHD-EPIC models of Ganymede. We calculate spatially resolved precipitating Jovian ion fluxes to the surface of Ganymede for energies 1 brightness variations. Thus, we conclude that precipitating energetic particle fluxes are the primary driver for altering the surface brightness of Ganymede.

  17. Bright Sparks of Our Future!

    Science.gov (United States)

    Riordan, Naoimh

    2016-04-01

    My name is Naoimh Riordan and I am the Vice Principal of Rockboro Primary School in Cork City, South of Ireland. I am a full time class primary teacher and I teach 4th class, my students are aged between 9-10 years. My passion for education has developed over the years and grown towards STEM (Science, Technology, Engineering and Mathematics) subjects. I believe these subjects are the way forward for our future. My passion and beliefs are driven by the unique after school programme that I have developed. It is titled "Sparks" coming from the term Bright Sparks. "Sparks" is an after school programme with a difference where the STEM subjects are concentrated on through lessons such as Science, Veterinary Science Computer Animation /Coding, Eco engineering, Robotics, Magical Maths, Chess and Creative Writing. All these subjects are taught through activity based learning and are one-hour long each week for a ten-week term. "Sparks" is fully inclusive and non-selective which gives all students of any level of ability an opportunity to engage into these subjects. "Sparks" is open to all primary students in County Cork. The "Sparks" after school programme is taught by tutors from the different Universities and Colleges in Cork City. It works very well because the tutor brings their knowledge, skills and specialised equipment from their respective universities and in turn the tutor gains invaluable teaching practise, can trial a pilot programme in a chosen STEM subject and gain an insight into what works in the physical classroom.

  18. Designers predict a bright future

    International Nuclear Information System (INIS)

    As power plant designers and builders, there is a bright future for the industry. The demand for electricity will continue to grow, and the need for new plants will increase accordingly. But companies that develop and supply these plants must adapt to new ways of doing business if they expect to see the dawn of this new age. Several factors will have a profound effect on the generation and use of electricity in future years. Instant communications now reach all corners of the globe, making people everywhere aspire to a higher standard of living. The economic surge needed to satisfy these appetites will, in turn, be fed by a network of suppliers who are themselves restructuring to serve global markets, unimpeded by past nationalistic barriers to trade. The strong correlation between economic progress and the growing demand for electricity is well recognized. A ready supply of affordable electricity is a necessary underpinning for any economic expansion. As economies advance and jobs increase, electric demand grows geometrically, fueled by an ever-improving quality of life. Coupled with increasing demand is the worldwide trend toward privatization of the generation industry. The reasons may vary in different parts of the world, but the effect is the same--companies are battling intensely for the right to build or purchase generating facilities. Those companies, like the industry they serve, are themselves in a period of transition. Once a closed, monopolistic group of owners in a predominantly services-based market, they are, thanks to competitive forces, being driven steadily toward a product-based structure

  19. Plasma-wall interactions

    International Nuclear Information System (INIS)

    The plasma wall interactions for two extreme cases, the 'vacuum model' and the 'cold gas blanket' are outlined. As a first step for understanding the plasma wall interactions the elementary interaction processes at the first wall are identified. These are energetic ion and neutral particle trapping and release, ion and neutral backscattering, ion sputtering, desorption by ions, photons and electrons and evaporation. These processes have only recently been started to be investigated in the parameter range of interest for fusion research. The few measured data and their extrapolation into regions not yet investigated are reviewed

  20. Study of low power deposition of ITO for top emission OLED with facing target and RF sputtering systems

    Energy Technology Data Exchange (ETDEWEB)

    Dangtip, S; Osotchan, T [Department of Physics and NANOTEC centre of excellence at Mahidol University, Faculty of Science, Mahidol University, Bangkok, 10400 (Thailand); Hoshi, Y; Kasahara, Y; Onai, Y; Sawada, Y; Uchida, T [Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa, 243-0297 (Japan)], E-mail: tesdt@mahidol.ac.th

    2008-03-15

    Deposition of ITO as top transparent electrode was studied using two deposition systems with and without direct contact to working plasma; namely with conventional RF-magnetron planar (RSS) and pulsed-DC facing target sputtering systems (FTS). Test devices were made on glass substrates and consisted of (from bottom up) ITO/4 Organic Layers/ITO. Depositions were performed at low deposition powers; 30 and 60 watts, to reduce damages by energetic sputtered particles to underlying organic layers. Test devices from both sputtering systems were found to function well. Leakage current density at -5 V reverse bias were relatively constant from 0.3 and 0.4 mA/cm{sup 2} at 30 W and 60 W in FTS, while the values were found to increase from 0.001 to 0.2 mA/cm{sup 2} at 30 W and 60 W in RSS.

  1. Lithium insertion in sputtered vanadium oxide film

    DEFF Research Database (Denmark)

    West, K.; Zachau-Christiansen, B.; Skaarup, S.V.;

    1992-01-01

    were oxygen deficient compared to V2O5. Films prepared in pure argon were reduced to V(4) or lower. The vanadium oxide films were tested in solid-state lithium cells. Films sputtered in oxygen showed electrochemical properties similar to crystalline V2O5. The main differences are a decreased capacity...

  2. RF Sputtering of Gold Contacts On Niobium

    Science.gov (United States)

    Barr, D. W.

    1983-01-01

    Reliable gold contacts are deposited on niobium by combination of RF sputtering and photolithography. Process results in structures having gold only where desired for electrical contact. Contacts are stable under repeated cycling from room temperature to 4.2 K and show room-temperature contact resistance as much as 40 percent below indium contacts made by thermalcompression bonding.

  3. Bright boys the making of information technology

    CERN Document Server

    Green, Tom

    2010-01-01

    Everything has a beginning. None was more profound-and quite as unexpected-than Information Technology. Here for the first time is the untold story of how our new age came to be and the bright boys who made it happen. What began on the bare floor of an old laundry building eventually grew to rival in size the Manhattan Project. The unexpected consequence of that journey was huge---what we now know as Information Technology. For sixty years the bright boys have been totally anonymous while their achievements have become a way of life for all of us. "Bright Boys" brings them home. By 1950 they'd

  4. The structure of bright zinc coatings

    Directory of Open Access Journals (Sweden)

    MIODRAG STOJANOVIC

    2000-11-01

    Full Text Available The structures of bright zinc coatings obtained from acid sulfate solutions in the presence of dextrin/salicyl aldehyde mixture were examined. It was shown by the STM technique that the surfaces of bright zinc coatings are covered by hexagonal zinc crystals, the tops of planes of which are flat and mutually parallel and which exhibit smoothness on the atomic level. X-Ray diffraction (XRD analysis of the bright zinc coatings showed that the zinc crystallites are oriented in the (110 plane only.

  5. Characterization of sputtered ZnO films under different sputter-etching time of substrate

    Institute of Scientific and Technical Information of China (English)

    LI Cui-ping; YANG Bao-he; QIAN Li-rong; XU Sheng; DAI Wei; LI Ming-ji; LI Xiao-wei; GAO Cheng-yao

    2011-01-01

    Polycrystalline ZnO films are prepared using radio frequency magnetron sputtering on glass substrates which are sputteretched for different time.Both the size of ZnO grains and the root-mean-square (RMS) roughness decrease,as the sputteretching time of the substrate increases.More Zn atoms are bound to O atoms in the films,and the defect concentration is decreased with increasing sputter-etching time of substrate.Meanwhile,the crystallinity and c-axis orientation are improved at longer sputter-etching time of the substrate.The Raman peaks at 99 cm-1,438 cm-1 and 589 cm-1 are identified as E2(low),E2(high) and E1(LO) modes,respectively,and the position of E1(LO) peak blue shifts at longer sputter-etching time.The transmittances of the films,which are deposited on the substrate and etched for 10 min and 20 min,are higher in the visible region than that of the films deposited under longer sputter-etching time of 30 min.The bandgap increases from 3.23 eV to 3.27 eV with the increase of the sputter-etching time of substrate.

  6. Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

    Directory of Open Access Journals (Sweden)

    Wojcieszak Damian

    2015-09-01

    Full Text Available Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

  7. Sputtering of the Europa surface by thermal ions from the torus and pickup ions in a diverted flow

    Science.gov (United States)

    Dols, Vincent J.; Cassidy, Timothy A.; Bagenal, Fran; Crary, Frank; Delamere, Peter A.

    2016-10-01

    Europa's atmosphere is very tenuous and is mainly composed of O2. It is thought to be produced by ion bombardment of its icy surface. Several ion populations may contribute to this sputtering:1) The thermal plasma of the torus (~ 1keV including ram velocity), which may be partially diverted around the moon by the ionospheric currents2) The energetic sulfur and hydrogen ions (~10 keV-MeV), which diffuse inward toward Europa's orbit3) and possibly the newly ionized O2 molecules that are picked up by the torus flow and hit the surface.The relative contribution of each sputtering ion population has been debated for more than three decades with estimated O2 sputtering rates varying by ~2 order of magnitude. Modelers have historically focused on a single piece of the puzzle: plasma modelers assume a static atmosphere and tend not to check that their sources and losses are consistent with their prescribed atmosphere; while atmospheric modelers neglect the electro-dynamic interaction that diverts torus plasma around the moon, and limits the ion flux to the surface.In this work, we present a first step to compute self-consistently the atmospheric production by the bombardment of the thermal plasma and pickup O2+ ions.1) We calculate the plasma flow around Europa with a MHD model2) We use this flow in a multi-species physical chemistry model of the plasma-atmosphere interaction to compute the ion fluxes into Europa's surface.3) We compute the production rate of O2 resulting from the ice sputtering by thermal and pickup ions and compare the resulting atmospheric source rate to previously published results.

  8. Deposition of sputtered iridium oxide-Influence of oxygen flow in the reactor on the film properties

    International Nuclear Information System (INIS)

    Thin films of iridium oxide have been deposited by reactive magnetron sputtering. The influence of oxygen partial pressure in the sputtering plasma on the composition, surface structure and morphology of the films has been studied by XRD, SEM and AFM analysis. An optimal combination of sputtering parameters yields stable microporous amorphous films with highly extended fractal surface. The electrochemical properties of these films have been investigated in view of their application as catalysts for water splitting, using the electrochemical techniques of cyclovoltammetry, electrochemical impedance spectroscopy, and steady state polarization. The SIROFs have shown an excellent electrochemical reversibility and a high catalytic activity toward the oxygen evolution reaction in 0.5 M H2SO4. A current density of 150 mA cm-2 at potential of 1.7 V (versus Ag/AgCl) has been obtained at catalyst load of only 100 μg cm-2. These results combined with the established long-term mechanical stability of the sputtered iridium oxide films (SIROFs) proved the advantages of the reactive magnetron sputtering as simple and reliable method for preparation of catalysts with precisely controlled composition, loading, and surface characteristics

  9. Brightness of synchrotron radiation from wigglers

    CERN Document Server

    Geloni, Gianluca; Saldin, Evgeni

    2014-01-01

    According to literature, while calculating the brightness of synchrotron radiation from wigglers, one needs to account for the so called `depth-of-field' effects. In fact, the particle beam cross section varies along the wiggler. It is usually stated that the effective photon source size increases accordingly, while the brightness is reduced. Here we claim that this is a misconception originating from an analysis of the wiggler source based on geometrical arguments, regarded as almost self-evident. According to electrodynamics, depth-of-field effects do not exist: we demonstrate this statement both theoretically and numerically, using a well-known first-principle computer code. This fact shows that under the usually accepted approximations, the description of the wiggler brightness turns out to be inconsistent even qualitatively. Therefore, there is a need for a well-defined procedure for computing the brightness from a wiggler source. We accomplish this task based on the use of a Wigner function formalism. I...

  10. The solar brightness temperature at millimeter wavelengths

    Science.gov (United States)

    Kuseski, R. A.; Swanson, P. N.

    1976-01-01

    Measurements of the brightness temperature of the sun near 36 GHz and 93 GHz were made using the new moon as a calibration source. Provided the brightness temperature of the moon is known and all measurements are reduced to the same zenith angle, a simple expression can be used for the sun-to-new moon ratio which is independent of antenna gain, atmospheric absorption and reemission, and radiometer calibration constants. This ratio was measured near 36 GHz and at two frequencies near 93 GHz with a Dicke switched superheterodyne radiometer system and a 2.4 m Cassegrain antenna. The slopes of the solar brightness temperature spectrum based on these ratios were measured. The absolute solar brightness spectrum derived from all current available measurements supplemented by the present ones is also plotted and discussed.

  11. A spectroscopic atlas of bright stars

    CERN Document Server

    Martin, Jack

    2009-01-01

    Suitable for amateur astronomers interested in practical spectroscopy or spectrography, this reference book identifies more than 70 (northern hemisphere) bright stars that are suitable observational targets. It provides finder charts for locating these sometimes-familiar stars.

  12. Improved adherence of sputtered titanium carbide coatings on nickel- and titanium-base alloys

    Science.gov (United States)

    Wheeler, D. R.; Brainard, W. A.

    1979-01-01

    Rene 41 and Ti-6Al-4V alloys were radio frequency sputter coated with titanium carbide by several techniques in order to determine the most effective. Coatings were evaluated in pin-on-disk tests. Surface analysis by X-ray photoelectron spectroscopy was used to relate adherence to interfacial chemistry. For Rene 41, good coating adherence was obtained when a small amount of acetylene was added to the sputtering plasma. The acetylene carburized the alloy surface and resulted in better bonding to the TiC coating. For Ti-6Al-4V, the best adherence and wear protection was obtained when a pure titanium interlayer was used between the coating and the alloy. The interlayer is thought to prevent the formation of a brittle, fracture-prone, aluminum oxide layer.

  13. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Zhuo Shiyi; Xiong Yuying; Gu Min, E-mail: xiongyy@scnu.edu.c [Laboratory of Quantum Information Technology, School of Physics and Telecommunication Engineering, South China Normal University, Guangzhou 510006 (China)

    2009-05-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn{sub 0.99}Cu{sub 0.01}O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1+. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  14. Magnetic properties of ZnO:Cu thin films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    Zhuo Shiyi; Xiong Yuying; Gu Min

    2009-01-01

    ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si (111) substrates, with targets of ZnO and Zn0.99Cu0.01 O, respectively. The plasma emission spectra were analyzed by using a grating monochromator during sputtering. The X-ray photoelectron spectroscopy measurements indicate the existence of Zni defect in the films, and the valence state of Cu is 1. The X-ray diffraction measurements indicate that the thin films have a hexagonal wurtzite structure and have a preferred orientation along the c-axis. The vibrating sample magnetometer measurements indicate that the sample is ferromagnetic at room temperature, and the origin of the magnetic behavior of the samples is discussed.

  15. Thin films preparation of the Ti-Al-O system by rf-sputtering

    International Nuclear Information System (INIS)

    In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti3Al targets in a sputtering chamber with an Ar-O2 atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

  16. Charge ordering in reactive sputtered (1 0 0) and (1 1 1) oriented epitaxial Fe3O4 films

    KAUST Repository

    Mi, Wenbo

    2013-06-01

    Epitaxial Fe3O4 films with (1 0 0) and (1 1 1) orientations fabricated by reactive sputtering present simultaneous magnetic and electrical transitions at 120 and 124 K, respectively. The symmetry decreases from face-centered cubic to monoclinic structure across the Verwey transition. Extra spots with different brightness at different positions appear in selected-area diffraction patterns at 95 K. The extra spots come from the charge ordering of outer-layer electrons of Fe atoms, and should be related to the charge ordering of octahedral B-site Fe atoms. © 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  17. Energy-exchange collisions of dark-bright-bright vector solitons.

    Science.gov (United States)

    Radhakrishnan, R; Manikandan, N; Aravinthan, K

    2015-12-01

    We find a dark component guiding the practically interesting bright-bright vector one-soliton to two different parametric domains giving rise to different physical situations by constructing a more general form of three-component dark-bright-bright mixed vector one-soliton solution of the generalized Manakov model with nine free real parameters. Moreover our main investigation of the collision dynamics of such mixed vector solitons by constructing the multisoliton solution of the generalized Manakov model with the help of Hirota technique reveals that the dark-bright-bright vector two-soliton supports energy-exchange collision dynamics. In particular the dark component preserves its initial form and the energy-exchange collision property of the bright-bright vector two-soliton solution of the Manakov model during collision. In addition the interactions between bound state dark-bright-bright vector solitons reveal oscillations in their amplitudes. A similar kind of breathing effect was also experimentally observed in the Bose-Einstein condensates. Some possible ways are theoretically suggested not only to control this breathing effect but also to manage the beating, bouncing, jumping, and attraction effects in the collision dynamics of dark-bright-bright vector solitons. The role of multiple free parameters in our solution is examined to define polarization vector, envelope speed, envelope width, envelope amplitude, grayness, and complex modulation of our solution. It is interesting to note that the polarization vector of our mixed vector one-soliton evolves in sphere or hyperboloid depending upon the initial parametric choices. PMID:26764780

  18. Energy-exchange collisions of dark-bright-bright vector solitons

    Science.gov (United States)

    Radhakrishnan, R.; Manikandan, N.; Aravinthan, K.

    2015-12-01

    We find a dark component guiding the practically interesting bright-bright vector one-soliton to two different parametric domains giving rise to different physical situations by constructing a more general form of three-component dark-bright-bright mixed vector one-soliton solution of the generalized Manakov model with nine free real parameters. Moreover our main investigation of the collision dynamics of such mixed vector solitons by constructing the multisoliton solution of the generalized Manakov model with the help of Hirota technique reveals that the dark-bright-bright vector two-soliton supports energy-exchange collision dynamics. In particular the dark component preserves its initial form and the energy-exchange collision property of the bright-bright vector two-soliton solution of the Manakov model during collision. In addition the interactions between bound state dark-bright-bright vector solitons reveal oscillations in their amplitudes. A similar kind of breathing effect was also experimentally observed in the Bose-Einstein condensates. Some possible ways are theoretically suggested not only to control this breathing effect but also to manage the beating, bouncing, jumping, and attraction effects in the collision dynamics of dark-bright-bright vector solitons. The role of multiple free parameters in our solution is examined to define polarization vector, envelope speed, envelope width, envelope amplitude, grayness, and complex modulation of our solution. It is interesting to note that the polarization vector of our mixed vector one-soliton evolves in sphere or hyperboloid depending upon the initial parametric choices.

  19. Sputtering of copper atoms by keV atomic and molecular ions A comparison of experiment with analytical and computer based models

    CERN Document Server

    Gillen, D R; Goelich,

    2002-01-01

    Non-resonant multiphoton ionisation combined with quadrupole and time-of-flight analysis has been used to measure energy distributions of sputtered copper atoms. The sputtering of a polycrystalline copper target by 3.6 keV Ar sup + , N sup + and CF sub 2 sup + and 1.8 keV N sup + and CF sub 2 sup + ion bombardment at 45 deg. has been investigated. The linear collision model in the isotropic limit fails to describe the high energy tail of the energy distributions. However the TRIM.SP computer simulation has been shown to provide a good description. The results indicate that an accurate description of sputtering by low energy, molecular ions requires the use of computer simulation rather than analytical approaches. This is particularly important when considering plasma-surface interactions in plasma etching and deposition systems.

  20. Sputter-initiated resonance ionization spectroscopy

    International Nuclear Information System (INIS)

    A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitivities down to 1 part in 1012 should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented. (Auth.)

  1. Magnetron sputtering of thin nitride films

    OpenAIRE

    Kola, Prashanthi V

    1995-01-01

    The objective in this investigation was to design and commission a magnetron sputter deposition system and investigate the properties of hard coatings for mechanical and biomedical applications. The deposition of titanium (Ti) and titanium nitride (TiN) was undertaken as part of the commissioning tests and further work was conducted on the effect of the deposition parameters on the properties of TiN, specifically for biocompatible applications. A thorough understanding of the deposition proce...

  2. Niobium sputter deposition on quarter wave resonators

    CERN Document Server

    Viswanadham, C; Jayaprakash, D; Mishra, R L

    2003-01-01

    Niobium sputter deposition on quarter wave copper R.F resonators, have been taken up in our laboratory, An ultra high vacuum system was made for this purpose. Niobium exhibits superconducting properties at liquid Helium temperature. A uniform coating of about 1.5 mu m of niobium on the internal surfaces of the copper resonant cavities is desired. Power dissipation in the resonators can be greatly reduced by making the internal surfaces of the R.F cavity super conducting. (author)

  3. Sputter coating of microspherical substrates by levitation

    Science.gov (United States)

    Lowe, A.T.; Hosford, C.D.

    Microspheres are substantially uniformly coated with metals or nonmetals by simltaneously levitating them and sputter coating them at total chamber pressures less than 1 torr. A collimated hole structure comprising a parallel array of upwardly projecting individual gas outlets is machined out to form a dimple. Glass microballoons,, which are particularly useful in laser fusion applications, can be substantially uniformly coated using the coating method and apparatus.

  4. Bright source lasers and experiments at very high irradiance

    International Nuclear Information System (INIS)

    The Los Alamos Bright Source has been assembled to explore the effects of intense coherent ultraviolet radiation on matter. This ultra-high brightness excimer laser is used to study the response of atoms, ions, and plasmas to the unique conditions the laser can provide. Primary areas of interest include properties and behavior of highly energetic atomic species, studies of possible intense field-induced nuclear transitions, pumping for x-ray lasers, and incoherent x-ray sources. The project consists of two phases: Los Alamos Bright Source I (LABS I) that is now in operation and is producing experimental data at an intensity up to 7 x 1017 watts/cm2 with 25 mJ of radiation and LABS II that will deliver between .1 and 1 J at an intensity of 1018 to 1020 w/cm2. At these high intensities we observe collisionless excitations to the KeV level. The exact nature of the excitation process is not known and is itself part of the investigation. Because of the coherent nature of the pump and the very large fields obtainable, new regimes of optical excitation can be expected and examined. Work is underway with LABS I to produce highly ionized species and measure their spectral and other properties. This equipment has proven to be highly reliable in the last year and should afford the opportunity for many basic studies. LABS II with its increased pulse energy and intensity will support studies involving larger pump volume and higher excitation levels. It should serve as a test bed for studies of pumping schemes for x-ray lasers. 6 refs., 8 figs., 3 tabs

  5. GaAs Films Prepared by RF-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  6. SPUTTERING FROM A POROUS MATERIAL BY PENETRATING IONS

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez-Nieva, J. F. [Instituto Balseiro, Universidad Nacional de Cuyo, 8400 Bariloche (Argentina); Bringa, E. M. [CONICET and Instituto de Ciencias Basicas, Universidad Nacional de Cuyo, 5500 Mendoza (Argentina); Cassidy, T. A. [CalTech/JPL, Pasadena, CA 91109 (United States); Johnson, R. E.; Fama, M.; Baragiola, R. A. [Laboratory for Atomic and Surface Physics, University of Virginia, Charlottesville, VA 22903 (United States); Caro, A. [Los Alamos National Laboratory, Los Alamos, NM 94551 (United States); Loeffler, M. J. [NASA Goddard Space Flight Center, Astrochemistry Branch, Code 691, Greenbelt, MD 20771 (United States); Farkas, D. [Department of Materials Sciences, Virginia Tech, Blacksburg, VA 24061 (United States)

    2011-12-10

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  7. Sputtering from a Porous Material by Penetrating Ions

    Science.gov (United States)

    Rodriguez-Nieva, J. F.; Bringa, E. M.; Cassidy, T. A.; Johnson, R. E.; Caro, A.; Fama, M.; Loeffler, M. J.; Baragiola, R. A.; Farkas, D.

    2011-12-01

    Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity, and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in the sputtering of a porous solid compared to the sputtering of the non-porous solid. Using molecular dynamics simulations we study the sputtering of a nanoporous solid with 55% of the solid density. We calculate the electronic sputtering induced by a fast, penetrating ion, using a thermal spike representation of the deposited energy. We find that sputtering for this porous solid is, surprisingly, the same as that for a full-density solid, even though the sticking coefficient is high.

  8. Closed field magnetron sputtering: new generation sputtering process for optical coatings

    Science.gov (United States)

    Gibson, D. R.; Brinkley, I.; Waddell, E. M.; Walls, J. M.

    2008-09-01

    "Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to designed rotating shutter mechanism. This paper presents data on optical properties for CFM deposited optical coatings, including anti-reflection, thermal control filters, graded coatings, narrowband filters as well as conductive transparent oxides such as indium tin oxide and carbide films. Benefits of the CFM sputter process are described.

  9. Spectroscopic Surface Brightness Fluctuations: Amplifying Bright Stars in Unresolved Stellar Populations

    Science.gov (United States)

    Mitzkus, M.; Dreizler, S.; Roth, M. M.

    2015-08-01

    We report on our early-stage efforts to resolve the Surface Brightness Fluctuations (SBFs) in the spectral dimension. Combining the diagnostic power of SBFs with the physical information content of spectra seems a tempting possibility to gain new insights into the bright stars in unresolved stellar populations. The new VLT integral field spectrograph MUSE is the first instrument that enables spectroscopic SBFs observationally.

  10. Reactive magnetron sputtering : from fundamentals to high deposition rate processes

    OpenAIRE

    Kubart, Tomas

    2013-01-01

    Reactive magnetron sputtering is widely used for synthesis of various compound thin films. The technique is very versatile and scalable. Especially in industry, high productivity is essential and there is a need for processes with high deposition rates. Achieving high deposition rate and true compound stoichiometry of the deposited film is, however, challenging in reactive sputtering. As a consequence of complex interaction between the reactive gas and the sputtered metal, the relation betwee...

  11. Bright Flares in Supergiant Fast X-ray Transients

    CERN Document Server

    Shakura, N; Sidoli, L; Paizis, A

    2014-01-01

    At steady low-luminosity states, Supergiant Fast X-ray Transients (SFXTs) can be at the stage of quasi-spherical settling accretion onto slowly rotating magnetized NS from the OB-companion winds. At this stage, a hot quasi-static shell is formed above the magnetosphere, the plasma entry rate into magnetosphere is controlled by (inefficient) radiative plasma cooling, and the accretion rate onto the NS is suppressed by a factor of \\sim 30 relative to the Bondi-Hoyle-Littleton value. Changes in the local wind velocity and density can only slightly increase the mass accretion rate (a factor of \\sim 10) bringing the system into the Compton cooling dominated regime and led to the production of moderately bright flares (L_x\\lesssim 10^{36} erg/s). To interpret the brightest flares (L_x>10^{36}~erg/s) displayed by the SFXTs, we propose that a larger increase in the mass accretion rate can be produced by sporadic capture of magnetized stellar wind plasma. At sufficiently low accretion rates, magnetic reconnection can ...

  12. Observing Faint Companions Close to Bright Stars

    Science.gov (United States)

    Serabyn, Eugene

    2012-04-01

    Progress in a number of technical areas is enabling imaging and interferometric observations at both smaller angular separations from bright stars and at deeper relative contrast levels. Here we discuss recent progress in several ongoing projects at the Jet Propulsion Laboratory. First, extreme adaptive optics wavefront correction has recently enabled the use of very short (i.e., blue) wavelengths to resolve close binaries. Second, phase-based coronagraphy has recently allowed observations of faint companions to within nearly one diffraction beam width of bright stars. Finally, rotating interferometers that can observe inside the diffraction beam of single aperture telescopes are being developed to detect close-in companions and bright exozodiacal dust. This paper presents a very brief summary of the techniques involved, along with some illustrative results.

  13. Increasing the brightness of light sources

    Energy Technology Data Exchange (ETDEWEB)

    Fu, Ling

    2006-11-16

    In this work the principle of light recycling is applied to artificial light sources in order to achieve brightness enhancement. Firstly, the feasibilities of increasing the brightness of light sources via light recycling are examined theoretically, based on the fundamental laws of thermodynamics including Kirchhoff's law on radiation, Planck's law, Lambert-Beer's law, the etendue conservation and the brightness theorem. From an experimental viewpoint, the radiation properties of three different kinds of light sources including short-arc lamps, incandescent lamps and LEDs characterized by their light-generating mechanisms are investigated. These three types of sources are used in light recycling experiments, for the purpose of 1. validating the intrinsic light recycling effect in light sources, e. g. the intrinsic light recycling effect in incandescent lamps stemming from the coiled filament structure. 2. acquiring the required parameters for establishing physical models, e.g. the emissivity/absorptivity of the short-arc lamps, the intrinsic reflectivity and the external quantum efficiency of LEDs. 3. laying the foundations for designing optics aimed at brightness enhancement according to the characteristics of the sources and applications. Based on the fundamental laws and experiments, two physical models for simulating the radiance distribution of light sources are established, one for thermal filament lamps, the other for luminescent sources, LEDs. As validation of the theoretical and experimental investigation of the light recycling effect, an optical device, the Carambola, is designed for achieving deterministic and multiple light recycling. The Carambola has the function of a concentrator. In order to achieve the maximum possible brightness enhancement with the Carambola, several combinations of sources and Carambolas are modelled in ray-tracing simulations. Sources with different light-emitting mechanisms and different radiation properties

  14. INFLUENCE OF LOW-ENERGY AR-SPUTTERING ON THE ELECTRONIC-PROPERTIES OF INAS-BASED QUANTUM-WELL STRUCTURES

    NARCIS (Netherlands)

    Magnee, P.H.C.; den Hartog, S.G.; Wees, B.J.van; Klapwijk, T.M; van de Graaf, W.; Borghs, G.

    1995-01-01

    The influence of low energy (80-500 eV) Ar-ion milling cleaning techniques on InAs based quantum well structures is investigated. It is found that both etching with a Kaufmann source and sputter-etching with a rf-plasma enhances the electron density and reduces the mobility. An anneal at 180 degrees

  15. Simulation of tungsten sputtering with EDGE2D–EIRENE in low triangularity L-mode JET ITER like wall configuration

    NARCIS (Netherlands)

    Harting, D.; Groth, M.; Beurskens, M.; Boerner, P.; Brix, M.; Coenen, J. W.; Corrigan, G.; Lehnen, M.; Marsen, S.; van Rooij, G. J.; Reiter, D.; Wiesen, S.

    2013-01-01

    The 2D edge plasma transport code EDGE2D-EIRENE has been upgraded to account for the actual material and geometric properties of the newly installed İTER\\} like wall (ILW) at JET. This includes the simulation of beryllium and tungsten impurities as well as a revised treatment of sputtering by main p

  16. Effect of process parameters on mechanical and tribological performance of pulsed-DC sputtered TiC/a-C : H nanocomposite films

    NARCIS (Netherlands)

    Shaha, K.P.; Pei, Y.T.; Martinez-Martinez, D.; Sanchez-Lopez, J.C.; Hosson, J.Th.M. De

    2010-01-01

    Mechanical, structural, chemical bonding (sp(3)/sp(2)). and tribological properties of films deposited by pulsed-DC sputtering of Ti targets in Ar/C2H2 plasma were studied as a function of the substrate bias voltage, Ti-target current, C2H2 flow rate and pulse frequency by nanoindentation, Raman spe

  17. Sputtering materials for VLSI and thin film devices

    CERN Document Server

    Sarkar, Jaydeep

    2010-01-01

    An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall p

  18. Modeling and stability analysis of the nonlinear reactive sputtering process

    Directory of Open Access Journals (Sweden)

    György Katalin

    2011-12-01

    Full Text Available The model of the reactive sputtering process has been determined from the dynamic equilibrium of the reactive gas inside the chamber and the dynamic equilibrium of the sputtered metal atoms which form the compound with the reactive gas atoms on the surface of the substrate. The analytically obtained dynamical model is a system of nonlinear differential equations which can result in a histeresis-type input/output nonlinearity. The reactive sputtering process has been simulated by integrating these differential equations. Linearization has been applied for classical analysis of the sputtering process and control system design.

  19. Modeling the Europa plasma torus

    Science.gov (United States)

    Schreier, Ron; Eviatar, Aharon; Vasyliunas, Vytenis M.; Richardson, John D.

    1993-12-01

    The existence of a torus of plasma generated by sputtering from Jupiter's satellite Europa has long been suspected but never yet convincingly demonstrated. Temperature profiles from Voyager plasma observations indicate the presence of hot, possibly freshly picked-up ions in the general vicinity of the orbit of Europa, which may be interpreted as evidence for a local plasma torus. Studies of ion partitioning in the outer regions of the Io torus reveal that the oxygen to sulfur mixing ratio varies with radial distance; this may indicates that oxygen-rich matter is injected from a non-Io source, most probably Europa. We have constructed a quantitative model of a plasma torus near the orbit of Europa which takes into account plasma input from the Io torus, sputtering from the surface of Europa, a great number of ionization and charge exchange processes, and plasma loss by diffusive transport. When the transport time is chosen so that the model's total number density in consistent with the observed total plasma density, the contribution from Europa is found to be significant although not dominant. The model predicts in detail the ion composition, charge states, and the relative fractions of hot Europa-generated and (presumed) cold Io-generated ions. The results are generally consistent with observations from Voyager and can in principle (subject to limitations of data coverage) be confirmed in more detail by Ulysses.

  20. RADIOASTRON OBSERVATIONS OF THE QUASAR 3C273: A CHALLENGE TO THE BRIGHTNESS TEMPERATURE LIMIT

    Energy Technology Data Exchange (ETDEWEB)

    Kovalev, Y. Y.; Kardashev, N. S.; Voitsik, P. A.; Kovalev, Yu. A.; Lisakov, M. M.; Sokolovsky, K. V. [Astro Space Center of Lebedev Physical Institute, Profsoyuznaya 84/32, 117997 Moscow (Russian Federation); Kellermann, K. I. [National Radio Astronomy Observatory, 520 Edgemont Road, Charlottesville, VA 22903-2475 (United States); Lobanov, A. P.; Zensus, J. A.; Anderson, J. M.; Bach, U.; Kraus, A. [Max-Planck-Institute for Radio Astronomy, Auf dem Hügel 69, D-53121 (Germany); Johnson, M. D. [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States); Gurvits, L. I. [Joint Institute for VLBI ERIC, P.O. Box 2, 7990 AA Dwingeloo (Netherlands); Jauncey, D. L. [CSIRO Astronomy and Space Sciences, Epping, NSW 1710 (Australia); Ghigo, F. [National Radio Astronomy Observatory, Rt. 28/92, Green Bank, WV 24944-0002 (United States); Ghosh, T.; Salter, C. J. [Arecibo Observatory, NAIC, HC3 Box 53995, Arecibo, Puerto Rico, PR 00612 (United States); Petrov, L. Yu. [Astrogeo Center, 7312 Sportsman Drive, Falls Church, VA 22043 (United States); Romney, J. D. [National Radio Astronomy Observatory, P.O. Box O, 1003 Lopezville Road, Socorro, NM 87801-0387 (United States)

    2016-03-20

    Inverse Compton cooling limits the brightness temperature of the radiating plasma to a maximum of 10{sup 11.5} K. Relativistic boosting can increase its observed value, but apparent brightness temperatures much in excess of 10{sup 13} K are inaccessible using ground-based very long baseline interferometry (VLBI) at any wavelength. We present observations of the quasar 3C 273, made with the space VLBI mission RadioAstron on baselines up to 171,000 km, which directly reveal the presence of angular structure as small as 26 μas (2.7 light months) and brightness temperature in excess of 10{sup 13} K. These measurements challenge our understanding of the non-thermal continuum emission in the vicinity of supermassive black holes and require a much higher Doppler factor than what is determined from jet apparent kinematics.

  1. The environment of Low Surface Brightness Galaxies

    OpenAIRE

    Rosenbaum, S. D.; Bomans, D. J.

    2004-01-01

    Using the Early Data Release of the Sloan Digital Sky Survey (SDSS) we investigated the clustering properties of Low Surface Brightness (LSB) galaxies in comparison to normal, High Surface Brightness (HSB) galaxies. We selected LSB galaxies and HSB galaxies with well measured redshifts from the SDSS data base and performed three-dimensional neighbour counting analysis within spheres of radii between 0.8 Mpc and 8.0 Mpc. As a second analysis method we used an N-th neighbour analysis with N var...

  2. The historical investigation of cometary brightness

    Science.gov (United States)

    Hughes, David W.

    1998-12-01

    The interpretation of the way in which the brightness of a comet varied as a function of both its heliocentric and geocentric distance was essentially started by Isaac Newton in his book Philosophiae Naturalis Principia Mathematica, published in 1687. Astronomers have argued about the form of this variability ever since, and for many years it was regarded as an important clue as to the physical nature of the cometary nucleus and its decay process. This paper reviews our understanding of the causes of cometary brightness variability between about 1680 and the 1950s.

  3. Reactive magnetron sputter deposition of superconducting niobium titanium nitride thin films with different target sizes

    CERN Document Server

    Bos, B G C; Haalebos, E A F; Gimbel, P M L; Klapwijk, T M; Baselmans, J J A; Endo, A

    2016-01-01

    The superconducting critical temperature (Tc>15 K) of niobium titanium nitride (NbTiN) thin films allows for low-loss circuits up to 1.1 THz, enabling on-chip spectroscopy and multi-pixel imaging with advanced detectors. The drive for large scale detector microchips is demanding NbTiN films with uniform properties over an increasingly larger area. This article provides an experimental comparison between two reactive d.c. sputter systems with different target sizes: a small target (100 mm diameter) system and a large target (127 mm x 444.5 mm) one, with the aim of improving the film uniformity using the large target system. We focus on the Tc of the films and I-V characteristics of the sputter plasma, and we find that both systems are capable of depositing films with Tc>15 K. We find that these films are deposited within the transition from metallic to compound sputtering, at the point where target nitridation most strongly depends on nitrogen flow. Key in the deposition optimization is to increase the system'...

  4. The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process

    Institute of Scientific and Technical Information of China (English)

    王庆; 王永富; 巴德纯; 岳向吉

    2012-01-01

    The effect of ion current density of argon plasma on target sputtering in magnetron sputtering process was investigated. Using home-made ion probe with computer-based data acquisition system, the ion current density as functions of discharge power, gas pressure and positions was measured. A double-hump shape was found in ion current density curve after the analysis of the effects of power and pressure. The data demonstrate that ion current density increases with the increase in gas pressure in spite of slightly at the double-hump site, sharply at wave-trough and side positions. Simultaneously, the ion current density increases upon increase in power. Es- pecially, the ion current density steeply increases at the double-hump site. The highest energy of the secondary electrons arising from Larmor precession was found at the double-hump position, which results in high ion density. The target was etched seriously at the double-hump position due to the high ion density there. The data indicates that the increase in power can lead to a high sputtering speed rate.

  5. Preparation and comparison of a-C:H coatings using reactive sputter techniques

    Energy Technology Data Exchange (ETDEWEB)

    Keunecke, M., E-mail: martin.keunecke@ist.fraunhofer.d [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Weigel, K.; Bewilogua, K. [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Cremer, R.; Fuss, H.-G. [CemeCon AG, Wuerselen (Germany)

    2009-12-31

    Amorphous hydrogenated carbon (a-C:H) coatings are widely used in several industrial applications. These coatings commonly will be prepared by plasma activated chemical vapor deposition (PACVD). The main method used to prepare a-C:H coating in industrial scale is based on a glow discharge in a hydrocarbon gas like acetylene or methane using a substrate electrode powered with medium frequency (m.f. - some 10 to 300 kHz). Some aims of further development are adhesion improvement, increase of hardness and high coating quality on complex geometries. A relatively new and promising technique to fulfil these requirements is the deposition of a-C:H coatings by a reactive d.c. magnetron sputter deposition from a graphite target with acetylene as reactive gas. An advancement of this technique is the deposition in a pulsed magnetron sputter process. Using these three mentioned techniques a-C:H coatings were prepared in the same deposition machine. For adhesion improvement different interlayer systems were applied. The effect of different substrate bias voltages (d.c. and d.c. pulse) was investigated. By applying the magnetron sputter technique in the d.c. pulse mode, plastic hardness values up to 40 GPa could be reached. Besides hardness other mechanical properties like resistance against abrasive wear were measured and compared. Cross sectional SEM images showed the growth structure of the coatings.

  6. Ion beam sputter deposition of TiNi shape memory alloy thin films

    Science.gov (United States)

    Davies, Sam T.; Tsuchiya, Kazuyoshi

    1999-08-01

    The development of functional or smart materials for integration into microsystem is of increasing interest. An example is the shape memory effect exhibited by certain metal alloys which, in principle, can be exploited in the fabrication of micro-scale manipulators or actuators, thereby providing on-chip micromechanical functionality. We have investigated an ion beam sputter deposition process for the growth of TiNi shape memory alloy thin films and demonstrated the required control to produce equiatomic composition, uniform coverage and atomic layer-by-layer growth rates on engineering surfaces. The process uses argon ions at intermediate energy produced by a Kaufman-type ion source to sputter non-alloyed targets of high purity titanium and nickel. Precise measurements of deposition rates allows compositional control during thin film growth. As the sputtering targets and substrates are remote from the discharge plasma, deposition occurs under good vacuum of approximately 10-6 mtorr thus promoting high quality films. Furthermore, the ion beam energetics allow deposition at relatively low substrate temperatures of heat capacity and thermal conductivity as the TiNi shape memory alloy undergoes martensitic to austenitic phase transformations.

  7. High-rate deposition of optical coatings by closed-field magnetron sputtering

    Science.gov (United States)

    Gibson, D. R.; Brinkley, I.; Waddell, E. M.; Walls, J. M.

    2005-09-01

    "Closed field" magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in a wide range of optical applications. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion current density, low bias voltage and reactive oxidation in the entire volume around the rotating substrate drum carrier, thereby producing films over a large surface area at high deposition rate with excellent and reproducible optical properties. Machines based on the Closed Field are scaleable to meet a range of batch and in-line size requirements. Typically, thin film thickness control to designed rotating shutter mechanism. The CFM configuration also allows plasma treatment of surfaces prior to deposition, allowing optimisation of coating adhesion to substrates such as plastics. This paper presents data on optical, durability and environmental properties for CFM deposited optical coatings, including anti-reflection, IR blocker and colour control and thermal control filters, graded coatings, as well as conductive transparent oxides such as indium tin oxide. Benefits of the CFM sputter process for a range of optical applications are described.

  8. Silica-sandwiched Au nanoparticle arrays by a soft PE-CVD/RF sputtering approach

    Energy Technology Data Exchange (ETDEWEB)

    Barreca, Davide [ISTM-CNR and INSTM, Department of Chemistry, Padova University, Via Marzolo, 1-35131 Padova (Italy); Gasparotto, Alberto; Maccato, Chiara; Tondello, Eugenio [Department of Chemistry, Padova University and INSTM, Via Marzolo, 1-35131 Padova (Italy)], E-mail: alberto.gasparotto@unipd.it

    2008-06-25

    This work is focused on the development of an innovative synthetic route to SiO{sub 2}-sandwiched Au nanoparticle arrays. The adopted strategy consists of: (i) the radio frequency sputtering of gold on thermally oxidized Si(100) and silica substrates from Ar plasmas; (ii) the plasma enhanced chemical vapor deposition of a SiO{sub 2} overlayer using tetramethoxysilane as precursor from Ar-O{sub 2} plasmas. A common feature of both preparative stages is the use of very soft processing conditions at temperatures close to room temperature, in order to tailor the Au nanoparticle morphology and to preserve it upon SiO{sub 2} coverage. In situ monitoring of gold deposition was accomplished by means of laser reflection interferometry. Valuable information on the system morphology before and after SiO{sub 2} coverage was provided by field emission-scanning electron microscopy for samples with different Au content. Additional important information on the system chemical composition, structure and optical response was gained by the combined use of x-ray photoelectron spectroscopy, glancing incidence x-ray diffraction and UV-visible absorption spectroscopy. The results obtained highlight the formation of high-purity SiO{sub 2}/Au/SiO{sub 2}-sandwiched stacks, in which the gold content and distribution, as well as the nanoparticle morphology, could be tailored by the sole variation of the sputtering time, without any further ex situ treatment.

  9. Low refractive index SiOF thin films prepared by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Garcia-Garcia, F.J.; Gil-Rostra, J.; Terriza, A.; González, J.C.; Cotrino, J. [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain); Frutos, F. [Departamento de Física Aplicada, E.T.S. Ingeniería Informática, University of Seville, Avd. Reina Mercedes s/n, E-41012 Seville (Spain); Ferrer, F.J. [Centro Nacional de Aceleradores, CSIC, Univ. Sevilla, Junta Andalucia, Thomas A. Edison 7, E-41092 Sevilla (Spain); González-Elipe, A.R. [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain); Yubero, F., E-mail: yubero@icmse.csic.es [Instituto de Ciencia de Materiales de Sevilla, CSIC, Univ. Sevilla, Av. Américo Vespucio 49, E-41092 Sevilla (Spain)

    2013-09-02

    We have studied low refractive index fluorine doped silica thin films prepared by reactive magnetron sputtering. Two experimental parameters were varied to increase the porosity of the films, the geometry of the deposition process (i.e., the use of glancing angle deposition) and the presence of chemical etching agents (fluorine species) at the plasma discharge during film growth. The microstructure, chemistry, optical properties, and porosity of the films have been characterized by scanning electron and atomic force microscopy, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, UV–vis, and spectroscopic ellipsometry. It is found that either the deposition at glancing angles or the incorporation of CF{sub x} species in the plasma discharge during film growth produces a decrease in the refractive index of the deposited films. The combined effect of the two experimental approaches further enhances the porosity of the films. Finally, the films prepared in a glancing geometry exhibit negative uniaxial birefringence. - Highlights: • SiOF thin films with controlled porosity prepared by reactive magnetron sputtering • Incorporation of CF{sub x} precursors in the plasma discharge enhances film porosity. • Deposition at glancing geometries further increases void fraction within the films.

  10. Magnetron reactively sputtered Ti-DLC coatings on HNBR rubber: The influence of substrate bias

    OpenAIRE

    Bui, X.L.; Pei, Y. T.; De Hosson, J. Th. M.

    2008-01-01

    In this study, Ti-containing diamond-like carbon (Ti-DLC) coatings have been deposited on HNBR (hydrogenated nitrile butadiene) rubber and also on Si wafer as reference via unbalanced magnetroli reactive sputtering from a Ti target in C2H2/Ar plasma. The deposition rates of coatings on rubber and Si wafer were about the same. Columnar structures resulting from a rough interface were often observed in the coatings deposited on rubbers. Only at a high bias voltage of -300 V the coating on HNBR ...

  11. Irreversible thermochromic response of RF sputtered nanocrystalline BaWO4 films for smart window applications

    OpenAIRE

    C. Anil Kumar; T. Santhosh Kumar; D. Pamu

    2015-01-01

    We report irreversible thermochromic behaviour of BaWO4 (BWO) films for the first time. BWO films have been deposited at different substrate temperatures (RT, 200, 400, 600 and 800 °C) using RF magnetron sputtering in pure argon plasma. BWO films deposited at 800 °C exhibit crystalline nature. Also, BWO films deposited in the temperature range of 400 - 600 °C exhibit WO3 as a secondary phase and its weight percentage decreases with an increase in deposition temperature, whereas the films depo...

  12. Microwave properties of RF- sputtered ZnFe{sub 2}O{sub 4} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Garg, T., E-mail: gargphy@iitb.ac.in; Kulkarni, A. R.; Venkataramani, N. [Department of Metallurgical Engineering and Materials Science, IIT Bombay, Mumbai-400076 (India); Sahu, B. N.; Prasad, Shiva [Department of Physics, IIT Bombay, Mumbai-400076 (India)

    2014-04-24

    In this work, RF- magnetron sputtering technique has been employed to deposit nanocrystalline ZnFe{sub 2}O{sub 4} thin films at room temperature. The as grown films were ex-situ annealed in air for 2 h at temperatures from 150°C to 650°C. X-ray diffraction, vibrating sample magnetometer and ferromagnetic resonance were used to analyze the phase formation, magnetic properties and microwave properties respectively. From the hysteresis loops and ferromagnetic resonance spectra taken at room temperature, a systematic study on the effect of O{sub 2} plasma on microwave properties with respect to processing temperature has been carried out.

  13. Spectroscopic Characterization and Simulation of Chemical Sputtering Using the DiMES Porous Plug Injector in DIII-D

    Energy Technology Data Exchange (ETDEWEB)

    McLean, A G; Davis, J W; Stangeby, P C; Brooks, N H; Whyte, D G; Allen, S L; Bray, B D; Brezinsek, S; Elder, J D; Fenstermacher, M E; Groth, M; Haasz, A A; Hollmann, E M; Isler, R; Lasnier, C J; Rudakov, D L; Watkins, J G; West, W P; Wong, C C

    2006-05-15

    A self-contained gas injection system for the Divertor Material Evaluation System (DiMES) on DIII-D has been employed for in-situ study of chemical erosion in the tokamak divertor environment. The Porous Plug Injector (PPI) releases methane, a major component of molecular influx due to chemical sputtering of graphite, from the tile surface into the plasma at a controlled rate through a porous graphite surface. Perturbation to local plasma is minimized, while also simulating the immediate environment of methane molecules released from a solid graphite surface. The release rate was chosen to be of the same order of magnitude as natural sputtering. Photon efficiencies of CH{sub 4} for measured local plasma conditions are reported. The contribution of chemical versus physical sputtering to the source of C{sup +} at the target is assessed through measurement of CII and CD/CH band emissions during release of CH{sub 4} from the PPI, and due to intrinsic emission.

  14. Origin of the energetic ion beams at the substrate generated during high power pulsed magnetron sputtering of titanium

    CERN Document Server

    Maszl, Christian; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    High power pulsed magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these energetic ions in HiPIMS is still an open issue, which is unraveled by using three fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\\mu$s, phase resolved optical emission spectroscopy with 1 $\\mu$s and the rotating shutter experiment with a resolution of 50 $\\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^+$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^{+}$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, ...

  15. Brightness of synchrotron radiation from wigglers

    Science.gov (United States)

    Geloni, Gianluca; Kocharyan, Vitali; Saldin, Evgeni

    2016-01-01

    According to the literature, while calculating the brightness of synchrotron radiation from wigglers, one needs to account for the so-called 'depth-of-field' effects. In fact, the particle beam cross-section varies along the wiggler. It is usually stated that the effective photon source size increases accordingly, while the brightness is reduced. Here we claim that this is a misconception originating from an analysis of the wiggler source based on geometrical arguments, regarded as almost self-evident. According to electrodynamics, depth-of-field effects do not exist: we demonstrate this statement both theoretically and numerically, using a well-known first-principle computer code. This fact shows that under the usually accepted approximations, the description of the wiggler brightness turns out to be inconsistent even qualitatively. Therefore, there is a need for a well-defined procedure for computing the brightness from a wiggler source. We accomplish this task based on the use of a Wigner function formalism. We exemplify this formalism in simple limiting cases. We consider the problem of the calculation of the wiggler source size by means of numerical simulations alone, which play the same role of an experiment. We report a significant numerical disagreement between exact calculations and approximations currently used in the literature.

  16. Dark Matter in Low Surface Brightness Galaxies

    NARCIS (Netherlands)

    Blok, W. J. G. de; McGaugh, S. S.

    1996-01-01

    Abstract: Low Surface Brightness (LSB) galaxies form a large population of disc galaxies that extend the Hubble sequence towards extreme late-types. They are only slowly evolving, and still in an early evolutionary state. The Tully-Fisher relation and rotation curves of LSB galaxies both show that L

  17. Dark matter in low surface brightness galaxies

    NARCIS (Netherlands)

    de Blok, WJG; McGaugh, SS; Persic, M; Salucci, P

    1997-01-01

    Low Surface Brightness (LSB) galaxies form a large population of disc galaxies that extend the Hubble sequence towards extreme late-types. They are only slowly evolving, and still in an early evolutionary state. The Tully-Fisher relation and rotation curves of LSB galaxies both show that LSB galaxie

  18. Probable Bright Supernova discovered by PSST

    Science.gov (United States)

    Smith, K. W.; Wright, D.; Smartt, S. J.; Young, D. R.; Huber, M.; Chambers, K. C.; Flewelling, H.; Willman, M.; Primak, N.; Schultz, A.; Gibson, B.; Magnier, E.; Waters, C.; Tonry, J.; Wainscoat, R. J.; Foley, R. J.; Jha, S. W.; Rest, A.; Scolnic, D.

    2016-09-01

    A bright transient, which is a probable supernova, has been discovered as part of the Pan-STARRS Survey for Transients (PSST). Information on all objects discovered by the Pan-STARRS Survey for Transients is available at http://star.pst.qub.ac.uk/ps1threepi/ (see Huber et al. ATel #7153).

  19. Brightness and darkness as perceptual dimensions.

    Directory of Open Access Journals (Sweden)

    Tony Vladusich

    2007-10-01

    Full Text Available A common-sense assumption concerning visual perception states that brightness and darkness cannot coexist at a given spatial location. One corollary of this assumption is that achromatic colors, or perceived grey shades, are contained in a one-dimensional (1-D space varying from bright to dark. The results of many previous psychophysical studies suggest, by contrast, that achromatic colors are represented as points in a color space composed of two or more perceptual dimensions. The nature of these perceptual dimensions, however, presently remains unclear. Here we provide direct evidence that brightness and darkness form the dimensions of a two-dimensional (2-D achromatic color space. This color space may play a role in the representation of object surfaces viewed against natural backgrounds, which simultaneously induce both brightness and darkness signals. Our 2-D model generalizes to the chromatic dimensions of color perception, indicating that redness and greenness (blueness and yellowness also form perceptual dimensions. Collectively, these findings suggest that human color space is composed of six dimensions, rather than the conventional three.

  20. A photometric investigation of a bright Geminid

    NARCIS (Netherlands)

    Degewij, J.; Diggelen, Johannes van

    1968-01-01

    Photographic observations of meteors in the Netherlands started with a bright Geminid of photographic magnitude −8 observed on December 11, 1955, 21h39m55s by M. Alberts. From the assumed radiant and velocity we have constructed the trajectory of the bolide. The luminosity of the trail has been dete

  1. Alberta Associations for Bright Children Members' Handbook.

    Science.gov (United States)

    Alberta Association for Bright Children, Edmonton.

    This handbook is designed to provide information to parents of gifted children in Alberta, Canada. The handbook outlines the mission and objectives of the Alberta Associations for Bright Children and describes the structure of the non-profit organization. The booklet then addresses: (1) the characteristics of gifted children; (2) the rights of…

  2. Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

    Energy Technology Data Exchange (ETDEWEB)

    Stranak, V., E-mail: stranak@physik.uni-greifswald.de [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Wulff, H. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Rebl, H. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Zietz, C. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Arndt, K. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Bogdanowicz, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany); Nebe, B. [University of Rostock, Biomedical Res. Center, Dept. of Cell Biology, Schillingallee 69, 18057 Rostock (Germany); Bader, R. [University of Rostock, Dept. of Orthopaedics, Doberaner Str. 142, 18057 Rostock (Germany); Podbielski, A. [University of Rostock, Dept. of Med. Microbiol., Virology and Hygiene, Schillingallee 70, 18057 Rostock (Germany); Hubicka, Z. [Academy of Sciences of the Czech Republic, Institute of Physics, Na Slovance 2, 180 00 Prague (Czech Republic); Hippler, R. [University of Greifswald, Institute of Physics, Felix-Hausdorff Str. 6, 17489 Greifswald (Germany)

    2011-10-10

    The antibacterial effect of thin titanium-copper (Ti-Cu) films combined with sufficient growth of human osteoblastic cells is reported in the paper. Thin Ti-Cu films were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron sputtering (dual-MS) as well as dual high power impulse magnetron sputtering (dual-HiPIMS). The antimicrobial effect is caused by copper released from the metallic Ti-Cu films, which was measured by atomic absorption spectroscopy (AAS). The copper release is influenced by the chemical and physical properties of the deposited films and was investigated by X-ray diffractometry and X-ray reflectometry (GIXD and XR) techniques. It was found that, within the first 24 h the amount of Cu released from dual-HiPIMS films (about 250 {mu}g) was much higher than from dc-MS and dual-MS films. In vitro planktonic growth tests on Ti-Cu surfaces for Staphylococcus epidermidis and S. aureus demonstrated the killing of both bacteria using the Ti-Cu films prepared using the dual-HiPIMS technique. The killing effects on biofilm bacteria were less obvious. After the total release of copper from the Ti-Cu film the vitality of exposed human osteoblast MG-63 cells increased significantly. An initial cytotoxic effect followed by the growth of osteoblastic cells was demonstrated. The cytotoxic effect combined with growth of osteoblastic cells could be used in joint replacement surgery to reduce the possibility of infection and to increase adoption of the implants. Highlights: {yields} Ti-Cu films with significant cytotoxic effect were prepared by dual-HiPIMS technique. {yields} The cytotoxic effect is caused by total release of copper species from thin films. {yields} The copper release is influenced by crystallography and chemical properties of thin films. {yields} Sufficient growth of osteoblastic cells follows after copper release.

  3. Circadian Phase-Shifting Effects of Bright Light, Exercise, and Bright Light + Exercise

    OpenAIRE

    Youngstedt, Shawn D.; Kline, Christopher E.; Elliott, Jeffrey A; Zielinski, Mark; Devlin, Tina M.; Moore, Teresa A.

    2016-01-01

    Limited research has compared the circadian phase-shifting effects of bright light and exercise and additive effects of these stimuli. The aim of this study was to compare the phase-delaying effects of late night bright light, late night exercise, and late evening bright light followed by early morning exercise. In a within-subjects, counterbalanced design, 6 young adults completed each of three 2.5-day protocols. Participants followed a 3-h ultra-short sleep-wake cycle, involving wakefulness...

  4. Niobium sputter-coated copper resonators

    CERN Document Server

    Benvenuti, Cristoforo; Campisi, I E; Darriulat, Pierre; Durand, C; Peck, M A; Russo, R; Valente, A M

    1998-01-01

    Niobium sputter-coated copper resonators are successfully employed in operating particle accelerators, the most outstanding example being LEP2 at CERN. In this review we present recent progress in the understanding of the basic principles governing their behaviour, based on an extensive R&D programme carried out at CERN on 1.5 GHz resonators operated in the TM010 mode. At the present stage of the s tudy, no fundamental limitation has been found which would prevent the use of this technology for future high-field, high-Q accelerating cavities.

  5. Coating metals on micropowders by magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Magnetron sputtering was used to coat various metals on micropowder surfaces. By using this method, the fine particles are better dispersed and can therefore be coated more homogeneously. The micro-powders used include cenospheres from fly ash of coal-burning electric power plants (diameter 40-200 μm and particle density 0.7±0.1 g/cm3), as well as carborundum particles of different sizes. Aluminum, silver, copper, cobalt and nickel were used as the coating metals. Tests showed that the coated metal film was compact adhering tightly on the base powders, and the coated powders possess adequate flow properties.

  6. Lattice dynamics during electronic sputtering of solid Ne

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1997-01-01

    Electronic sputtering of solid neon has been studied with molecular dynamics. The cavity formation around an excited atom and particle migration in the surface region, as well as the sputtering process have been studied. A single atomic exciton has been observed to produce a desorption of up...

  7. Growth of brass nanofilms sputtered on organic substrate

    Institute of Scientific and Technical Information of China (English)

    CHEN Zhen-xing; WANG Ling-sen; HUANG Bai-yun

    2005-01-01

    The growth of brass nanofilms sputtered on acrylics substrate was studied through experimental investigation of the effect of sputtering voltage, target-to-substrate distance, chamber pressure and sputtering time on the content, growth rate and surface morphology of brass nanofilms. The results show that compared with original brass target, Cu content in brass nanofilms changes by no more than 6.23% (mass fraction). High sputtering voltage and short target-to-substrate distance help to improve brass nanofilm deposition rate. There exists an optimal chamber pressure where deposition rate of nanofilm reaches the maximum. The key factor affecting surface morphology is the kinetic energy of sputtering particles. Low sputtering voltage, large target-to-substrate distance and low chamber pressure are very important for the formation of the high-quality brass nanofilms. The brass films prepared under the conditions of sputtering voltage 1.6 kV, target-to-substrate distance 2.5 cm, chamber pressure 10 Pa and sputtering time 20 min, possess following characteristics: smooth and uniform surface, thickness of 41 nm and Cu content of 71.0% (mass fraction).

  8. Sputtering of solid nitrogen by keV helium ions

    DEFF Research Database (Denmark)

    Ellegaard, O.; Schou, Jørgen; Sørensen, H.;

    1993-01-01

    Solid nitrogen has become a standard material among the frozen molecular gases for electronic sputtering. We have combined measurements of sputtering yields and energy spectra from nitrogen bombarded by 4-10 keV helium ions. The data show that the erosion is electronic rather than knockon...

  9. Sputtering of the most volatile solids: The solid hydrogens

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Ellegaard, O.;

    1995-01-01

    Electronic sputtering of the three stable hydrogenic solids, H-2, HD and D-2 by keV hydrogen and deuterium ions has been studied at the low-temperature setup at Riso. The yield of the sputtered particles has been determined for hydrogenic films of thicknesses ranging from 0.1 X 10(18) up to 10 X 10...

  10. Sputtering of Ge(001): transition between dynamic scaling regimes

    DEFF Research Database (Denmark)

    Smilgies, D.-M.; Eng, P.J.; Landemark, E.;

    1997-01-01

    We have studied the dynamic behavior of the Ge(001) surface during sputtering in situ and in real time using synchrotron X-ray diffraction. We find two dynamic regimes as a function of surface temperature and sputter current which are separated by a sharp transition. The boundary between these two...

  11. Sputtering of Thick Deuterium Films by KeV Electrons

    DEFF Research Database (Denmark)

    Thestrup Nielsen, Birgitte; Svendsen, Winnie Edith; Schou, Jørgen;

    1994-01-01

    Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion...

  12. Molecular dynamics simulations on the effect of sub-surface helium bubbles on the sputtering yield of tungsten

    Energy Technology Data Exchange (ETDEWEB)

    Sefta, F. [Department of Nuclear Engineering, University of California, Berkeley, CA 94720-1730 (United States); Juslin, N.; Hammond, K.D. [Department of Nuclear Engineering, University of Tennessee, Knoxville, TN 37996-2300 (United States); Wirth, B.D., E-mail: bdwirth@utk.edu [Department of Nuclear Engineering, University of California, Berkeley, CA 94720-1730 (United States); Department of Nuclear Engineering, University of Tennessee, Knoxville, TN 37996-2300 (United States)

    2013-07-15

    Tungsten is being considered for the divertor in ITER and for future nuclear fusion reactors because of its high melting temperature and high thermal conductivity. While the sputtering yield of tungsten is generally low, previous observations of surface modification due to plasma exposure raise questions about the effects of surface morphology and sub-surface helium bubble populations on the sputtering behavior. Results of computational molecular dynamics are reported that investigate the influence of sub-surface helium bubble distributions on the sputtering yield of tungsten {1 0 0} and {1 1 0} surfaces induced by helium ion exposure in the range of 300 eV to 1 keV. The specific microstructures and incident ion energies have been coordinated with planned experiments, which will be reported in the future. The calculated sputtering yields are in reasonable agreement with a wide range of experimental data, but do not show any significant variation as a result of the pre-existing helium bubbles.

  13. Monte Carlo simulations of nanoscale focused neon ion beam sputtering.

    Science.gov (United States)

    Timilsina, Rajendra; Rack, Philip D

    2013-12-13

    A Monte Carlo simulation is developed to model the physical sputtering of aluminum and tungsten emulating nanoscale focused helium and neon ion beam etching from the gas field ion microscope. Neon beams with different beam energies (0.5-30 keV) and a constant beam diameter (Gaussian with full-width-at-half-maximum of 1 nm) were simulated to elucidate the nanostructure evolution during the physical sputtering of nanoscale high aspect ratio features. The aspect ratio and sputter yield vary with the ion species and beam energy for a constant beam diameter and are related to the distribution of the nuclear energy loss. Neon ions have a larger sputter yield than the helium ions due to their larger mass and consequently larger nuclear energy loss relative to helium. Quantitative information such as the sputtering yields, the energy-dependent aspect ratios and resolution-limiting effects are discussed.

  14. The effect of the oxygen concentration and the rf power on the zinc oxide films properties deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sayago, I. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Aleixandre, M. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Ares, L. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Fernandez, M.J. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Santos, J.P. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Gutierrez, J. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain); Horrillo, M.C. [Laboratorio de Sensores IFA-CSIC, Serrano 144, 28006 Madrid (Spain)]. E-mail: carmenhorrillo@ifa.cetef.csic.es

    2005-05-30

    The influence of the oxygen concentration and the rf power variation on the zinc oxide films structural properties were studied. ZnO films were deposited on silicon substrate by rf magnetron sputtering in reactive plasma using a zinc oxide target. Crystalline structures and roughness characteristics of the films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements, respectively. Deposition conditions were optimized to obtain films of good quality suitable for the fabrication of surface acoustic wave (SAW) devices. The optimal parameters to obtain a good piezoelectric material have been: rf power 50 W and reactive plasma.

  15. Observational Test for the Solar Wind Sputtering Origin of the Moon's Extended Sodium Atmosphere

    Science.gov (United States)

    Mendillo, Michael; Baumgardner, Jeffrey; Wilson, Jody

    1999-01-01

    We present observations of the lunar sodium atmosphere during four lunar eclipses between 1993 and 1997. With the Moon inside the magnetosphere, and therefore shielded from solar wind impact, we find its Na atmosphere to be comparable in abundance to cases near first and third quarter, implying that solar wind ion sputtering is not a significant source of the atmosphere. The atmosphere is azimuthally symmetric, and it extends beyond the field of view of our observations (∼12 Lunar radii). The average sodium atmospheric profile is best characterized by anr-1.4radial power law, close to that for an entirely escaping atmosphere. The average extrapolated near-surface brightness of 1145 rayleighs is in agreement with the near-surface polar brightness seen at quarter Moon. This corresponds to a line-of-sight neutral column content of 1.4×109Na atoms cm-2above the limb and a density of ∼3 atoms cm-3above the surface, decreasing asr-2.4. We suggest that a blend of sources (15% micrometeor impact uniform over the surface and 85% photon-induced desorption dependent on solar-zenith angle over the sunlit hemisphere) could account for the observed extended sodium atmospheres.

  16. Sputtering effect of low-energy ions on biological target: The analysis of sputtering product of urea and capsaicin

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Lili [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China); Xu, Xue [Rice Research Institute, Anhui Academy of Agricultural Sciences, Nongke South Road 40, Hefei 230031 (China); Wu, Yuejin, E-mail: yjwu@ipp.ac.cn [Key Laboratory of Ion Beam Bio-Engineering, Institute of Technical Biology and Agriculture Engineering of Chinese Academy of Sciences, Shushanhu Road 350, Hefei 230031 (China)

    2013-08-01

    Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Recent years, ion implantation was successfully applied to biological research based on the fragments sputtering and form open paths in cell structure caused by ion sputtering. In this study, we focused on urea and chilli pepper pericarp samples implanted with N{sup +} and Ar{sup +} ions. To investigate the sputtering effect, we designed a collecting unit containing a disk sample and a glass pipe. The urea content and capsaicin content recovered from glass pipes were adopted to represent the sputtering product. The result of urea showed that the sputtering effect is positively correlated with the ion energy and dose, also affected by the ion type. The result of capsaicin was different from that of urea at 20 keV and possibly due to biological complex composition and structure. Therefore the sputtering yield depended on both the parameters of incident ions and the state of target materials. The sputtering yield of urea was also simulated by computational method achieved through the TRIM program. The trajectories of primary and recoiled atoms were calculated on the basis of the binary collision approximation using Monte Carlo method. The experimental results were much higher than the calculated results. The possible explanation is that in the physical model the target were assumed as a disordered lattice and independent atoms, which is much less complicated than that of the biological models.

  17. A Compact High-Brightness Heavy-Ion Injector

    CERN Document Server

    Westenskow, Glen; Grote, D P; Halaxa, Erni; Kwan, Joe W

    2005-01-01

    To provide compact high-brightness heavy-ion beams for Heavy Ion Fusion (HIF) accelerators, we have been experimenting with merging multi-beamlets in an injector which uses an RF plasma source. In an 80-kV 20-microsecond experiment, the RF plasma source has produced up to 5 mA of Ar+ in a single beamlet. An extraction current density of 100 mA/cm2 was achieved, and the thermal temperature of the ions was below 1 eV. More than 90% of the ions were in the Ar+ state, and the energy spread from charge exchange was found to be small. We have tested at full voltage gradient the first 4 gaps of a 61-beamlet injector design. Einzel lens were used to focus the beamlets while reducing the beamlet to beamlet space charge interaction. We will report on a converging 119 multi-beamlet source. Although the source has the same optics as a full 1.6 MV injector system, the test will be carried out at 400 kV due to the test stand HV limit. We will measure the beam’s emittance after the beamlets are merged and have bee...

  18. Evolution of laser-produced Sn extreme ultraviolet source diameter for high-brightness source

    International Nuclear Information System (INIS)

    We have investigated the effect of irradiation of solid Sn targets with laser pulses of sub-ns duration and sub-mJ energy on the diameter of the extreme ultraviolet (EUV) emitting region and source conversion efficiency. It was found that an in-band EUV source diameter as low as 18 μm was produced due to the short scale length of a plasma produced by a sub-ns laser. Most of the EUV emission occurs in a narrow region with a plasma density close to the critical density value. Such EUV sources are suitable for high brightness and high repetition rate metrology applications.

  19. Growth of high quality YBa2Cu3O7-δ and PrBa2Cu3O7-δ films with an on-axis RF sputtering configuration

    International Nuclear Information System (INIS)

    Controllable fabrication of highly oriented c-axis YBCO thin films with good electrical properties, inplane epitaxy and smooth surfaces is required for the preparation of multilayers or superlattices of YBa2Cu3O7-δ/PrBa2Cu3O7-δ (YBCO/PBCO). In order to realize this type of heterostructures the epitaxial growth of c-axis thin films of YBCO and PBCO deposited by on-axis RF magnetron sputtering was studied. However, the YBCO films made in a planar RF sputtering system often show degraded superconducting (SC) properties. It is generally admitted that this is due to the presence of highly energetic particles (E.P.) in the sputtering plasma (1). They are at the origin of a bombardment producing selective resputtering of the growing film that results in film's strong off-stoichiometry and disturbed crystallinity explaining their weak superconductivity. The aim of our work was to determine the nature of the perturbation induced by the sputtering plasma and the type of defects created in the film by the E.P., by studying YBCO lattice with Raman spectrometry and other different techniques. We show that the presence of highly E.P. in the sputtering plasma principally disturb the oxygen sublattice by a bombardement mechanism inducing oxygen vacancies in the CuO chains and at the apex site. Consequently, the SC properties of the YBCO films are determined by the quantity of these defects. We find that the amount of the E.P. is reduced by increasing the plasma total pressure. So, the quantity of the oxygen vacancies decreases and the films display better structural and electrical properties. The same sputtering growth process was found for the PBCO films. Under the optimum growth conditions, given by higher total pressure, high quality c-axis oriented YBCO and PBCO films were obtained. Finally, multilayers and superlattices made by sequential sputtering were also elaborated in this work. (orig.)

  20. The bright optical flash from GRB 060117

    CERN Document Server

    Jel'inek, M; Kubánek, P; Hudec, R; Nekola, M; Grygar, J; Castro-Tirado, A J; Gorosabel, J; Hrabovsk'y, M; Mandat, D; Nosek, D; Palatka, M; Pandey, S B; Pech, M; Schovanek, P; De Postigo, A U; Vítek, S; Jel\\'inek, Martin; Prouza, Michael; Kub\\'anek, Petr; Hudec, Ren\\'e; Nekola, Martin; R}\\'idk\\'y, Jan {; Grygar, Ji{r}\\'i; Castro-Tirado, Alberto J.; Gorosabel, Javier; Hrabovsk\\'y, Miroslav; Mand\\'at, Du{s}an; Nosek, Dalibor; Palatka, Miroslav; Pandey, Shashi B.; Pech, Miroslav; Schov\\'anek, Petr; S}m\\'ida, Radom\\'ir {; Postigo, Antonio de Ugarte; V\\'itek, Stanislav

    2006-01-01

    We present a discovery and observation of an extraordinarily bright prompt optical emission of the GRB 060117 obtained by a wide-field camera atop the robotic telescope FRAM of the Pierre Auger Observatory from 2 to 10 minutes after the GRB. We found rapid average temporal flux decay of alpha = -1.7 +- 0.1 and a peak brightness R = 10.1 mag. Later observations by other instruments set a strong limit on the optical and radio transient fluxes, unveiling an unexpectedly rapid further decay. We present an interpretation featuring a relatively steep electron-distribution parameter p ~ 3.0 and providing a straightforward solution for the overall fast decay of this optical transient as a transition between reverse and forward shock.

  1. Quantum Bright Soliton in a Disorder Potential

    Science.gov (United States)

    Sacha, K.; Delande, D.; Zakrzewski, J.

    2009-11-01

    At very low temperature, a quasi-one-dimensional ensemble of atoms with attractive interactions tend to form a bright soliton. When exposed to a sufficiently weak external potential, the shape of the soliton is not modified, but its external motion is affected. We develop in detail the Bogoliubov approach for the problem, treating, in a non-perturbative way, the motion of the center of mass of the soliton. Quantization of this motion allows us to discuss its long time properties. In particular, in the presence of a disordered potential, the quantum motion of the center of mass of a bright soliton may exhibit Anderson localization, on a localization length which may be much larger than the soliton size and could be observed experimentally.

  2. Modular Zero Energy. BrightBuilt Home

    Energy Technology Data Exchange (ETDEWEB)

    Aldrich, Robb [Steven Winter Associates, Inc., Norwalk, CT (United States); Butterfield, Karla [Steven Winter Associates, Inc., Norwalk, CT (United States)

    2016-03-01

    With funding from the Building America Program, part of the U.S. Department of Energy Building Technologies Office, the Consortium for Advanced Residential Buildings (CARB) worked with BrightBuilt Home (BBH) to evaluate and optimize building systems. CARB’s work focused on a home built by Black Bros. Builders in Lincolnville, Maine (International Energy Conservation Code Climate Zone 6). As with most BBH projects to date, modular boxes were built by Keiser Homes in Oxford, Maine.

  3. Surface Brightness Fluctuations as Stellar Population Indicators

    OpenAIRE

    Blakeslee, John P

    2009-01-01

    Surface Brightness Fluctuations (SBF) can provide useful information about the unresolved stellar content of early-type galaxies and spiral bulges. The absolute SBF magnitude Mbar in a given passband depends on the properties of the stellar population and can be predicted by population synthesis models. SBF measurements in different bandpasses are sensitive to different evolutionary stages within the galaxy stellar population. Near-IR SBF magnitudes are sensitive to the evolution of stars wit...

  4. Bright Solitary Waves in Malignant Gliomas

    OpenAIRE

    Pérez-García, Víctor M.; Calvo, Gabriel F.; Belmonte-Beitia, Juan; Diego, D.; Pérez-Romasanta, Luis

    2011-01-01

    We put forward a nonlinear wave model describing the fundamental physio-pathologic features of an aggressive type of brain tumors: glioblastomas. Our model accounts for the invasion of normal tissue by a proliferating and propagating rim of active glioma cancer cells in the tumor boundary and the subsequent formation of a necrotic core. By resorting to numerical simulations, phase space analysis and exact solutions, we prove that bright solitary tumor waves develop in such systems.

  5. Extreme Ultraviolet Explorer Bright Source List

    Science.gov (United States)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  6. On the origin of facular brightness

    CERN Document Server

    Kostik, R

    2016-01-01

    This paper studies the dependence of the CaIIH line core brightness on the strength and inclination of photospheric magnetic field, and on the parameters of convective and wave motions in a facular region at the solar disc center. We use three simultaneous datasets obtained at the German Vacuum Tower Telescope (Observatorio del Teide, Tenerife): (1) spectra of BaII 4554 A line registered with the instrument TESOS to measure the variations of intensity and velocity through the photosphere up to the temperature minimum; (2) spectropolarimetric data in FeI 1.56 $\\mu$m lines (registered with the instrument TIP II) to measure photospheric magnetic fields; (3) filtergrams in CaIIH that give information about brightness fluctuations in the chromosphere. The results show that the CaIIH brightness in the facula strongly depends on the power of waves with periods in the 5-min range, that propagate upwards, and also on the phase shift between velocity oscillations at the bottom photosphere and around the temperature min...

  7. The Bright SHARC Survey The Cluster Catalog

    CERN Document Server

    Romer, A K; Holden, B P; Ulmer, M P; Pildis, R A; Merrelli, A J; Adami, C; Burke, D J; Collins, C A; Metevier, A J; Kron, Richard G; Commons, K

    1999-01-01

    We present the Bright SHARC (Serendipitous High-Redshift Archival ROSAT Cluster) Survey, which is an objective search for serendipitously detected extended X-ray sources in 460 deep ROSAT PSPC pointings. The Bright SHARC Survey covers an area of 178.6 sq.deg and has yielded 374 extended sources. We discuss the X-ray data reduction, the candidate selection and present results from our on-going optical follow-up campaign. The optical follow-up concentrates on the brightest 94 of the 374 extended sources and is now 97% complete. We have identified thirty-seven clusters of galaxies, for which we present redshifts and luminosities. The clusters span a redshift range of 0.0696Bright SHARC clusters have not been listed in any previously ...

  8. Search for bright stars with infrared excess

    International Nuclear Information System (INIS)

    Bright stars, stars with visual magnitude smaller than 6.5, can be studied using small telescope. In general, if stars are assumed as black body radiator, then the color in infrared (IR) region is usually equal to zero. Infrared data from IRAS observations at 12 and 25μm (micron) with good flux quality are used to search for bright stars (from Bright Stars Catalogues) with infrared excess. In magnitude scale, stars with IR excess is defined as stars with IR color m12−m25>0; where m12−m25 = −2.5log(F12/F25)+1.56, where F12 and F25 are flux density in Jansky at 12 and 25μm, respectively. Stars with similar spectral type are expected to have similar color. The existence of infrared excess in the same spectral type indicates the existence of circum-stellar dust, the origin of which is probably due to the remnant of pre main-sequence evolution during star formation or post AGB evolution or due to physical process such as the rotation of those stars

  9. LA Palma Night-Sky Brightness

    CERN Document Server

    Benn, C R; Benn, Chris R.; Ellison, Sara L.

    1998-01-01

    The brightness of the moonless night sky above La Palma was measured on 427 CCD images taken with the Isaac Newton and Jacobus Kapteyn Telescopes on 63 nights during 1987 - 1996. The median sky brightness at high elevation, high galactic latitude and high ecliptic latitude, at sunspot minimum, is B = 22.7, V = 21.9, R = 21.0, similar to that at other dark sites. The main contributions to sky brightness are airglow and zodiacal light. The sky is brighter at low ecliptic latitude (by 0.4 mag); at solar maximum (by 0.4 mag); and at high airmass (0.25 mag brighter at airmass 1.5). Light pollution (line + continuum) contributes < 0.03 mag in U, approximately 0.02 mag in B, approximately 0.10 mag in V, approximately and 0.10 mag in R at the zenith. This paper is a summary of results which are presented in full elsewhere (Benn & Ellison 1998, La Palma Technical Note 115).

  10. Plasma cell vulvitis

    Directory of Open Access Journals (Sweden)

    Pravin R Bharatia

    2015-01-01

    Full Text Available Plasma cell vulvitis is a very rare inflammatory disorder of vulva, characterized by a bright-red mucosal lesion of significant chronicity, which may be symptomatic. Very few case studies of this condition are reported in literature. We describe one such classical patient, who presented with slight dyspareunia. The diagnosis was confirmed on histopathological examination. It is important for clinicians to accurately diagnose this alarming condition in time.

  11. Simulation of spectroscopic patterns obtained in W/C test-limiter sputtering experiment at TEXTOR

    International Nuclear Information System (INIS)

    On the TEXTOR tokamak various experiments aimed at investigation of tungsten erosion and transport are performed. In one experiment a spherical W/C twin limiter positioned close to the last-closed flux surface in the near scrape-off layer was exposed to a number of comparable plasma discharges with stepwise variations of edge plasma parameters. Spatial distribution of tungsten and carbon light emission was recorded with two dimensional CCD cameras and spectrometer systems with high spectral and spatial resolution. Penetration depths, tungsten sputtering fluxes and erosion yields were measured. Comparison between experimental data and the results of modelling with the 3D Monte-Carlo code ERO is performed. The main objective of this study was to test the adequacy of the existing atomic data for neutral tungsten. The modelled penetration depths of the light emission of tungsten are a factor of 2–3 smaller than in experiment, which may indicate the overestimation of ionization rates

  12. Surface treatment method for 1/f noise suppression in reactively sputtered nickel oxide film

    Science.gov (United States)

    Kim, Dong Soo; Park, Seung-Man; Lee, Hee Chul

    2012-07-01

    A surface treatment method combined with O2 plasma treatment and Ar+ bombardment is proposed for 1/f noise suppression in a reactively sputtered NiO film as a micro-bolometer sensing material. The 1/f noise power spectral density on a sample prepared by the proposed surface treatment method prior to the contact formation is suppressed to a level roughly 18 times lower than that on an untreated sample. The improved noise characteristic can be ascribed to the cooperative effects of the two steps in the proposed surface treatment method. In its effects, the oxygen plasma treatment is supposed to increase the Ni3+ component on the surface of the NiO film, which in turn increases the hole concentration on the surface. Additional Ar+ bombardment is expected to remove contaminants on the surface of the NiO film, leading to a low contact resistance.

  13. Method to control deposition rate instabilities—High power impulse magnetron sputtering deposition of TiO{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Kossoy, Anna, E-mail: annaeden@hi.is, E-mail: anna.kossoy@gmail.com; Magnusson, Rögnvaldur L.; Tryggvason, Tryggvi K.; Leosson, Kristjan; Olafsson, Sveinn [Physics Division, Science Institute—University of Iceland, Reykjavik 107 (Iceland)

    2015-03-15

    The authors describe how changes in shutter state (open/closed) affect sputter plasma conditions and stability of the deposition rate of Ti and TiO{sub 2} films. The films were grown by high power impulse magnetron sputtering in pure Ar and in Ar/O{sub 2} mixture from a metallic Ti target. The shutter state was found to have an effect on the pulse waveform for both pure Ar and reactive sputtering of Ti also affecting stability of TiO{sub 2} deposition rate. When the shutter opened, the shape of pulse current changed from rectangular to peak-plateau and pulse energy decreased. The authors attribute it to the change in plasma impedance and gas rarefaction originating in geometry change in front of the magnetron. TiO{sub 2} deposition rate was initially found to be high, 1.45 Å/s, and then dropped by ∼40% during the first 5 min, while for Ti the change was less obvious. Instability of deposition rate poses significant challenge for growing multilayer heterostructures. In this work, the authors suggest a way to overcome this by monitoring the integrated average energy involved in the deposition process. It is possible to calibrate and control the film thickness by monitoring the integrated pulse energy and end growth when desired integrated pulse energy level has been reached.

  14. Reduction of Defects in SiOx Vapor Permeation Barriers on Polymer Substrates by Introducing a Sputtered Interlayer

    Science.gov (United States)

    Yun, Jungheum; Lee, Sunghun; Jeong, Yujeong; Lee, Hong-Rim; Kwon, Jung-Dae; Lee, Gun-Hwan

    2009-05-01

    This paper investigated the water-vapor permeability of silicon oxide (SiOx) barriers grown on poly(ethylene terephthalate) (PET) substrates using plasma-enhanced chemical vapor deposition (PECVD). The water-vapor transmission rate (WVTR) of granular-type SiOx barriers is dependent upon the density of microscopic pinholes in the barriers. A two-step hybrid process, consisting of (i) a sputtering stage for 10-nm-thick Al2O3 interlayer growth and (ii) a subsequent PECVD stage for thicker SiOx film growth, was proposed in this study. Granules and pinholes in SiOx barriers were simultaneously eliminated by introducing an Al2O3 interlayer on the PET surface prior to the SiOx PECVD process. Plasma-induced reconstruction of PET surfaces was prevented by applying a reactive sputtering process to grow the Al2O3 interlayer. High-quality barriers were developed from SiOx growth on the sputtered interlayer. Low WVTR values in the range of 10-3 g m-2 d-1 were recorded in tests using a MOCON instrument. The WVTR was two orders of magnitude smaller than that of conventional SiOx barriers directly grown on PET substrates without the Al2O3 interlayer.

  15. Intrinsic stress analysis of sputtered carbon film

    Institute of Scientific and Technical Information of China (English)

    Liqin Liu; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Moyan Tan; Qiushi Huang; Rui Chen; Jing Xu; Lingyan Chen

    2008-01-01

    Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated.The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses.The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition.By varying argon pressure and target-substrate distance,energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level.The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.

  16. Magnetization relaxation in sputtered thin permalloy films

    Science.gov (United States)

    Oliveira, R. C.; Rodríguez-Suárez, R. L.; Aguiar, F. M. De; Rezende, S. M.; Fermin, J. R.; Azevedo, A.

    2004-05-01

    In order to understand the underlying phenomena of magnetization damping in metallic thin films, samples of permalloy films were grown by magnetron sputtering, and their 8.6-GHz ferromagnetic resonance linewidth ΔH has been measured as a function of the Permalloy (Py) film thickness t, at room temperature. We made samples of Py(t)/Si(001) and X/Py(t)/X/Si(001), with X=Pd (40Å), and Cr (25Å), with 20Å < t < 200Å. While ΔH scales with t-2 in the bare Py/Si series, it is shown that the damping behavior strongly depends on X in the sandwich samples.

  17. New oxygen radical source using selective sputtering of oxygen atoms for high rate deposition of TiO{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Yasuda, Yoji; Lei, Hao; Hoshi, Yoichi [Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan); State Key Laboratory for Corrosion and Protection, Surface Engineering of Materials Division, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 (China); Department of Electronics and Information Technology, Tokyo Polytechnic University, Kanagawa 243-0297 (Japan)

    2012-11-15

    We have developed a new oxygen radical source based on the reactive sputtering phenomena of a titanium target for high rate deposition of TiO{sub 2} films. In this oxygen radical source, oxygen radicals are mainly produced by two mechanisms: selective sputter-emission of oxygen atoms from the target surface covered with a titanium oxide layer, and production of high-density oxygen plasma in the space near the magnetron-sputtering cathode. Compared with molecular oxygen ions, the amount of atomic oxygen radicals increased significantly with an increase in discharge current so that atomic oxygen radicals were mainly produced by this radical source. It should be noted that oxygen atoms were selectively sputtered from the target surface, and titanium atoms sputter-emitted from the target cathode were negligibly small. The amount of oxygen radicals supplied from this radical source increased linearly with increasing discharge current, and oxygen radicals of 1 Multiplication-Sign 10{sup 15} atoms/s/cm{sup 2} were supplied to the substrate surface at a discharge current of 1.2 A. We conclude that our newly developed oxygen radical source can be a good tool to achieve high rate deposition and to control the structure of TiO{sub 2} films for many industrial design applications.

  18. Hydrogenated amorphous silicon deposited by ion-beam sputtering

    Science.gov (United States)

    Lowe, V. E.; Henin, N.; Tu, C.-W.; Tavakolian, H.; Sites, J. R.

    1981-01-01

    Hydrogenated amorphous silicon films 1/2 to 1 micron thick were deposited on metal and glass substrates using ion-beam sputtering techniques. The 800 eV, 2 mA/sq cm beam was a mixture of argon and hydrogen ions. The argon sputtered silicon from a pure (7.6 cm) single crystal wafer, while the hydrogen combined with the sputtered material during the deposition. Hydrogen to argon pressure ratios and substrate temperatures were varied to minimize the defect state density in the amorphous silicon. Characterization was done by electrical resistivity, index of refraction and optical absorption of the films.

  19. Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering.

    Science.gov (United States)

    Diwan, Anubhav; Singh, Bhupinder; Roychowdhury, Tuhin; Yan, DanDan; Tedone, Laura; Nesterenko, Pavel N; Paull, Brett; Sevy, Eric T; Shellie, Robert A; Kaykhaii, Massoud; Linford, Matthew R

    2016-02-01

    We describe a new process for preparing porous solid phase microextraction (SPME) coatings by the sputtering of silicon onto silica fibers. The microstructure of these coatings is a function of the substrate geometry and mean free path of the silicon atoms, and the coating thickness is controlled by the sputtering time. Sputtered silicon structures on silica fibers were treated with piranha solution (a mixture of concd H2SO4 and 30% H2O2) to increase the concentration of silanol groups on their surfaces, and the nanostructures were silanized with octadecyldimethylmethoxysilane in the gas phase. The attachment of this hydrophobic ligand was confirmed by X-ray photoelectron spectroscopy and contact angle goniometry on model, planar silicon substrates. Sputtered silicon coatings adhered strongly to their surfaces, as they were able to pass the Scotch tape adhesion test. The extraction time and temperature for headspace extraction of mixtures of alkanes and alcohols on the sputtered fibers were optimized (5 min and 40 °C), and the extraction performances of SPME fibers with 1.0 or 2.0 μm of sputtered silicon were compared to those from a commercial 7 μm poly(dimethylsiloxane) (PDMS) fiber. For mixtures of alcohols, aldehydes, amines, and esters, the 2.0 μm sputtered silicon fiber yielded signals that were 3-9, 3-5, 2.5-4.5, and 1.5-2 times higher, respectively, than those of the commercial fiber. For the heavier alkanes (undecane-hexadecane), the 2.0 μm sputtered fiber yielded signals that were approximately 1.0-1.5 times higher than the commercial fiber. The sputtered fibers extracted low molecular weight analytes that were not detectable with the commercial fiber. The selectivity of the sputtered fibers appears to favor analytes that have both a hydrophobic component and hydrogen-bonding capabilities. No detectable carryover between runs was noted for the sputtered fibers. The repeatability (RSD%) for a fiber (n = 3) was less than 10% for all analytes tested

  20. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering

    Science.gov (United States)

    Ward, Logan

    The demand for economical high-performance materials has brought attention to the development of advanced coatings. Recent advances in high power magnetron sputtering (HPPMS) have shown to improve tribological properties of coatings. These coatings offer increased wear and oxidation resistance, which may facilitate the use of more economical materials in harsh applications. This study demonstrates the use of novel forms of HPPMS, namely modulated pulsed-power magnetron sputtering (MPPMS) and deep oscillation magnetron sputtering (DOMS), for depositing TiN and Ti1-xAlxN tribological coatings on commonly used alloys, such as Ti-6Al-4V and Inconel 718. Both technologies have been shown to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously only achievable by cathodic arc deposition (CAD); however, CAD can lead to increased macroparticles that are unfavorable in high friction and corrosive environments. MPPMS, DOMS, and other HPPMS techniques offer unique plasma characteristics and have been shown to produce coatings with refined grain structure, improved density, hardness, adhesion, and wear resistance. Using DOMS and MPPMS, TiN and Ti1-xAlxN coatings were deposited using PMS to compare microstructures and tribological performance. For Ti1-xAlxN, two sputtering target compositions, Ti 0.5Al0.5 and Ti0.3Al0.7, were used to evaluate the effects of MPPMS on the coating's composition and tribological properties. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD) were used to characterize microstructure and crystallographic texture. Several tribological properties were evaluated including: wear rate, coefficient of friction, adhesion, and nanohardness. Results show that substrate

  1. Auger electron spectroscopy in sputtering measurements: Application to low-energy Ar+ sputtering of Ag and Nb

    International Nuclear Information System (INIS)

    The sputtering of Ag and Nb by Ar+ in the energy range from 0.5 to 1.5 keV has been measured. The agreement with extant data, where available, is good. The experimental technique is a new adaptation of certain earlier methods and employs Auger electron spectroscopy of a continuously sputtered area of a thin-film composite structure, produced by vapor deposition. This new method should permit very low sputter yields (Sapproximately-less-than10-3) to be measured in subsequent experiments

  2. Evolution of bulgeless low surface brightness galaxies

    Science.gov (United States)

    Shao, X.; Hammer, F.; Yang, Y. B.; Liang, Y. C.

    Based on the Sloan Digital Sky Survey DR 7, we investigate the environment, morphology, and stellar population of bulgeless low surface-brightness (LSB) galaxies in a volume-limited sample with redshift ranging from 0.024 to 0.04 and M r LSB galaxies have more young stars and are more metal-poor than regular LSB galaxies. These results suggest that the evolution of LSB galaxies may be driven by their dynamics, including mergers rather than by their large-scale environment.

  3. Raman beam combining for laser brightness enhancement

    Energy Technology Data Exchange (ETDEWEB)

    Dawson, Jay W.; Allen, Graham S.; Pax, Paul H.; Heebner, John E.; Sridharan, Arun K.; Rubenchik, Alexander M.; Barty, Chrisopher B. J.

    2015-10-27

    An optical source capable of enhanced scaling of pulse energy and brightness utilizes an ensemble of single-aperture fiber lasers as pump sources, with each such fiber laser operating at acceptable pulse energy levels. Beam combining involves stimulated Raman scattering using a Stokes' shifted seed beam, the latter of which is optimized in terms of its temporal and spectral properties. Beams from fiber lasers can thus be combined to attain pulses with peak energies in excess of the fiber laser self-focusing limit of 4 MW while retaining the advantages of a fiber laser system of high average power with good beam quality.

  4. The radio properties of bright Seyfert galaxies

    Energy Technology Data Exchange (ETDEWEB)

    Giuricin, G.; Mardirossian, F.; Mezzetti, M.; Bertotti, G. (Centro Interuniversitario Regionale per l' Astrofisica e la Cosmologia (Italy) Centre for Advanced Research in Space Optics (Italy))

    1990-03-01

    The radio properties of a sample of 69 bright spectroscopically selected Seyfert galaxies, which suffers from little bias toward Markarian galaxies with strong UV excess. At variance with most of the earlier results, generally based on galaxy samples which are strongly biased toward the inclusion of Markarian objects, there is no clear evidence of a significant difference in the major radio properties (radio power, radio-to-optical luminosity ratio, radio spectral index and radio size) of type 1 and type 2 Seyferts. The resulting observational scenario appears now to be more consistent than before with the idea that Seyfert 2 galaxies are simply Seyfert 1 obscured objects. 70 refs.

  5. Monitoring of bright blazars with MAGIC telescope

    OpenAIRE

    Hsu, C. C.; Satalecka, K.; Thom, M; Backes, M.; Bernardini, E.; Bonnoli, G.; Galante, N.; Goebel, F; Lindfors, E.; Majumdar, P.; Stamerra, A.; Wagner, R. M.

    2009-01-01

    Blazars, a class of Active Galactic Nuclei (AGN) characterized by a close orientation of their relativistic outflows (jets) towards the line of sight, are a well established extragalactic TeV $\\gamma$-ray emitters. Since 2006, three nearby and TeV bright blazars, Markarian (Mrk) 421, Mrk 501 and 1ES 1959+650, are regularly observed by the MAGIC telescope with single exposures of 30 to 60 minutes. The sensitivity of MAGIC allows to establish a flux level of 30% of the Crab flux for each such o...

  6. Quantum bright soliton in a disorder potential

    OpenAIRE

    Sacha, K.; Delande, D; Zakrzewski, J.

    2009-01-01

    At very low temperature, a quasi-one-dimensional ensemble of atoms with attractive interactions tend to form a bright soliton. When exposed to a sufficiently weak external potential, the shape of the soliton is not modified, but its external motion is affected. We develop in detail the Bogoliubov approach for the problem, treating, in a non-perturbative way, the motion of the center of mass of the soliton. Quantization of this motion allows us to discuss its long time properties. In particula...

  7. The role of the Fraunhofer lines in solar brightness variability

    CERN Document Server

    Shapiro, A I; Krivova, N A; Tagirov, R V; Schmutz, W K

    2015-01-01

    The solar brightness varies on timescales from minutes to decades. A clear identification of the physical processes behind such variations is needed for developing and improving physics-based models of solar brightness variability and reconstructing solar brightness in the past. This is, in turn, important for better understanding the solar-terrestrial and solar-stellar connections. We estimate the relative contributions of the continuum, molecular, and atomic lines to the solar brightness variations on different timescales. Our approach is based on the assumption that variability of the solar brightness on timescales greater than a day is driven by the evolution of the solar surface magnetic field. We calculated the solar brightness variations employing the solar disc area coverage of magnetic features deduced from the MDI/SOHO observations. The brightness contrasts of magnetic features relative to the quiet Sun were calculated with a non-LTE radiative transfer code as functions of disc position and waveleng...

  8. Investigation of kinetics model of dc reactive sputtering

    Institute of Scientific and Technical Information of China (English)

    朱圣龙; 王福会; 吴维叓

    1996-01-01

    A novel physical sputtering kinetics model for reactive sputtering is presented.Reactive gas gettering effects and interactions among the characteristic parameters have been taken into account in the model.The data derived from the model accorded fairly well with experimental results.The relationship between the values of initial oxide coverage on the target and the ready states was depicted in the model.This relationship gives reasons for the difference of the threshold of reactive gas fluxes (Q) from the metal sputtering region to the oxide sputtering region and in reverse direction.The discontinuities in oxide coverage on the target surface (θ) versus reactive gas fluxes (Q) are referred to as the effects of reactive gas partial pressure (p) upon the forming rates of oxide on the surfaces of target (V0).The diversity of the oxygen flux threshold results from the variance of the initial values of oxide coverage on target.

  9. Sputter-Resistant Materials for Electric Propulsion Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR Phase 2 project shall develop sputter-resistant materials for use in electric propulsion test facilities and for plume shields on spacecraft using...

  10. Sputtering System for QWR Cavity in BRIF Project

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    <正>1 Introduction Four superconducting QWR cavities will be used in HI-13 tandem accelerator upgrade project (BRIF). These niobium coated cavities will be produced by CIAE. Up to now, a niobium sputtering

  11. Sputter deposition of aluminium on colloidal polymer templates

    Energy Technology Data Exchange (ETDEWEB)

    Gehrke, Rainer; Buffet, Adeline; Couet, Sebastien; Schlage, Kai; Roth, Stephan V.; Roehlsberger, Ralf [HASYLAB, DESY, Hamburg (Germany); Herzog, Gerd [HASYLAB, DESY, Hamburg (Germany); Inst. f. Exp. Phys., Univ. Hamburg (Germany); Kaune, Gunar; Koerstgens, Volker; Meier, Robert; Metwalli, Ezzeldin; Mueller-Buschbaum, Peter [TU Muenchen, Physik-Department, Garching (Germany); Wurth, Wilfried [Inst. f. Exp. Phys., Univ. Hamburg (Germany)

    2009-07-01

    This work addresses an approach to the formation of metal nanowire meshes on surfaces. Colloidal dispersions of 100 nm polystyrene spheres were spincoated on silicon. Islands of packed layers of spheres were formed which served as template for sputter deposition of aluminium. Structure formation was investigated with grazing incidence small angle X-ray scattering at beamline BW4 at HASYLAB/DESY using an in-situ sputtering chamber, thus scattering could be observed during metal deposition. The measurements indicate, that at the beginning of the deposition the metal atoms assemble in the indentations between the spheres, only after longer sputtering times the surface becomes completely covered with aluminium. If an unsputtered sample was heated beyond the glass transition temperature the lateral ordering vanished, if sputtering was stopped before complete metal coverage ordering remained upon heating. This indicates that the metal forms a stable structure separating the polymer spheres from each other.

  12. Magnetospheric ion sputtering and water ice grain size at Europa

    Science.gov (United States)

    Cassidy, T. A.; Paranicas, C. P.; Shirley, J. H.; Dalton, J. B., III; Teolis, B. D.; Johnson, R. E.; Kamp, L.; Hendrix, A. R.

    2013-03-01

    We present the first calculation of Europa's sputtering (ion erosion) rate as a function of position on Europa's surface. We find a global sputtering rate of 2×1027 H2O s-1, some of which leaves the surface in the form of O2 and H2. The calculated O2 production rate is 1×1026 O2 s-1, H2 production is twice that value. The total sputtering rate (including all species) peaks at the trailing hemisphere apex and decreases to about 1/3rd of the peak value at the leading hemisphere apex. O2 and H2 sputtering, by contrast, is confined almost entirely to the trailing hemisphere. Most sputtering is done by energetic sulfur ions (100s of keV to MeV), but most of the O2 and H2 production is done by cold oxygen ions (temperature ∼ 100 eV, total energy ∼ 500 eV). As a part of the sputtering rate calculation we compared experimental sputtering yields with analytic estimates. We found that the experimental data are well approximated by the expressions of Famá et al. for ions with energies less than 100 keV (Famá, M., Shi, J., Baragiola, R.A., 2008. Sputtering of ice by low-energy ions. Surf. Sci. 602, 156-161), while the expressions from Johnson et al. fit the data best at higher energies (Johnson, R.E., Burger, M.H., Cassidy, T.A., Leblanc, F., Marconi, M., Smyth, W.H., 2009. Composition and Detection of Europa's Sputter-Induced Atmosphere, in: Pappalardo, R.T., McKinnon, W.B., Khurana, K.K. (Eds.), Europa. University of Arizona Press, Tucson.). We compare the calculated sputtering rate with estimates of water ice regolith grain size as estimated from Galileo Near-Infrared Mapping Spectrometer (NIMS) data, and find that they are strongly correlated as previously suggested by Clark et al. (Clark, R.N., Fanale, F.P., Zent, A.P., 1983. Frost grain size metamorphism: Implications for remote sensing of planetary surfaces. Icarus 56, 233-245.). The mechanism responsible for the sputtering rate/grain size link is uncertain. We also report a surface composition estimate using

  13. Sputter initiated RIS (SIRIS) for analysis of semiconductor impurities

    International Nuclear Information System (INIS)

    This paper describes the technique, Sputter Initiated Resonance Ionization Spectroscopy (SIRIS), being developed for commercial analysis by Atom Sciences, Inc. This technique uses Resonance Ionization Spectroscopy to selectively ionize atoms of a sample sputtered by an energetic ion beam. The efficiency and selectivity of the RIS process provides results which are ultrasensitive and unambiguous to interpret. The SIRIS instrument being developed by Atom Sciences and recent results showing the present sensitivity limit of 2 ppb will be discussed. (author)

  14. Transition from linear to nonlinear sputtering of solid xenon

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen;

    1995-01-01

    Self-sputtering of solid xenon has been studied with molecular dynamics simulations as a model system for the transition from dominantly linear to strongly nonlinear effects. The simulation covered the projectile energy range from 20 to 750 eV. Within a relatively narrow range from 30 to 250 e......V, nonlinear features such as high collision densities in the sputtering volume, amorphization of the crystalline structure, and an enhanced emission of low-energy atoms occur gradually....

  15. Erosion of beryllium under high-flux plasma impact

    Energy Technology Data Exchange (ETDEWEB)

    Doerner, R.P., E-mail: rdoerner@ucsd.edu [Center for Energy Research, UCSD, La Jolla, CA 92093-0417 (United States); Björkas, C. [EURATOM-Tekes, Department of Physics, University of Helsinki, P.O.B. 64, 00014 Helsinki (Finland); Institute for Energy Research-Plasma Physics, Forchungszentrun Jülich GmbH, 52425 Jülich (Germany); Nishijima, D. [Center for Energy Research, UCSD, La Jolla, CA 92093-0417 (United States); Schwarz-Selinger, T. [Max-Planck Institut für Plasmaphysik, EURATOM Association, Boltzmannstrasse 2, D-85748 Garching (Germany)

    2013-07-15

    Be sputtering yields, measured by weight loss, in PISCES-B are a factor of 5–10 less than that predicted by binary collision approximations. Measurements show the BeO surface is removed early in the plasma bombardment. Modeling of molecular ions (D{sub 2}{sup +} and D{sub 3}{sup +}) species and redeposition cannot explain the difference. Surface morphology that evolves during the exposure reduces the sputtering yield by a factor of 2–3. Plasma fuel atoms retained in the surface decrease the sputtering yield compared to calculations of a pure Be surface. These effects may explain the measured erosion rates in the absence of Be impurities within the plasma. By introducing Be impurity ions into the plasma, it is possible to simulate a controllable amount of redeposition. The weight loss from eroding Be targets, with Be seeding, is unchanged until the concentration of Be ions in the plasma greatly exceeds the sputtering yield in the non-beryllium seeded exposure.

  16. Plasma production for electron acceleration by resonant plasma wave

    Science.gov (United States)

    Anania, M. P.; Biagioni, A.; Chiadroni, E.; Cianchi, A.; Croia, M.; Curcio, A.; Di Giovenale, D.; Di Pirro, G. P.; Filippi, F.; Ghigo, A.; Lollo, V.; Pella, S.; Pompili, R.; Romeo, S.; Ferrario, M.

    2016-09-01

    Plasma wakefield acceleration is the most promising acceleration technique known nowadays, able to provide very high accelerating fields (10-100 GV/m), enabling acceleration of electrons to GeV energy in few centimeter. However, the quality of the electron bunches accelerated with this technique is still not comparable with that of conventional accelerators (large energy spread, low repetition rate, and large emittance); radiofrequency-based accelerators, in fact, are limited in accelerating field (10-100 MV/m) requiring therefore hundred of meters of distances to reach the GeV energies, but can provide very bright electron bunches. To combine high brightness electron bunches from conventional accelerators and high accelerating fields reachable with plasmas could be a good compromise allowing to further accelerate high brightness electron bunches coming from LINAC while preserving electron beam quality. Following the idea of plasma wave resonant excitation driven by a train of short bunches, we have started to study the requirements in terms of plasma for SPARC_LAB (Ferrario et al., 2013 [1]). In particular here we focus on hydrogen plasma discharge, and in particular on the theoretical and numerical estimates of the ionization process which are very useful to design the discharge circuit and to evaluate the current needed to be supplied to the gas in order to have full ionization. Eventually, the current supplied to the gas simulated will be compared to that measured experimentally.

  17. Sublimation in bright spots on (1) Ceres.

    Science.gov (United States)

    Nathues, A; Hoffmann, M; Schaefer, M; Le Corre, L; Reddy, V; Platz, T; Cloutis, E A; Christensen, U; Kneissl, T; Li, J-Y; Mengel, K; Schmedemann, N; Schaefer, T; Russell, C T; Applin, D M; Buczkowski, D L; Izawa, M R M; Keller, H U; O'Brien, D P; Pieters, C M; Raymond, C A; Ripken, J; Schenk, P M; Schmidt, B E; Sierks, H; Sykes, M V; Thangjam, G S; Vincent, J-B

    2015-12-10

    The dwarf planet (1) Ceres, the largest object in the main asteroid belt with a mean diameter of about 950 kilometres, is located at a mean distance from the Sun of about 2.8 astronomical units (one astronomical unit is the Earth-Sun distance). Thermal evolution models suggest that it is a differentiated body with potential geological activity. Unlike on the icy satellites of Jupiter and Saturn, where tidal forces are responsible for spewing briny water into space, no tidal forces are acting on Ceres. In the absence of such forces, most objects in the main asteroid belt are expected to be geologically inert. The recent discovery of water vapour absorption near Ceres and previous detection of bound water and OH near and on Ceres (refs 5-7) have raised interest in the possible presence of surface ice. Here we report the presence of localized bright areas on Ceres from an orbiting imager. These unusual areas are consistent with hydrated magnesium sulfates mixed with dark background material, although other compositions are possible. Of particular interest is a bright pit on the floor of crater Occator that exhibits probable sublimation of water ice, producing haze clouds inside the crater that appear and disappear with a diurnal rhythm. Slow-moving condensed-ice or dust particles may explain this haze. We conclude that Ceres must have accreted material from beyond the 'snow line', which is the distance from the Sun at which water molecules condense. PMID:26659183

  18. At Bright Band Inside Victoria Crater

    Science.gov (United States)

    2007-01-01

    A layer of light-toned rock exposed inside Victoria Crater in the Meridiani Planum region of Mars appears to mark where the surface was at the time, many millions of years ago, when an impact excavated the crater. NASA's Mars Exploration Rover Opportunity drove to this bright band as the science team's first destination for the rover during investigations inside the crater. Opportunity's left front hazard-identification camera took this image just after the rover finished a drive of 2.25 meters (7 feet, 5 inches) during the rover's 1,305th Martian day, or sol, (Sept. 25, 2007). The rocks beneath the rover and its extended robotic arm are part of the bright band. Victoria Crater has a scalloped shape of alternating alcoves and promontories around the crater's circumference. Opportunity descended into the crater two weeks earlier, within an alcove called 'Duck Bay.' Counterclockwise around the rim, just to the right of the arm in this image, is a promontory called 'Cabo Frio.'

  19. Globe at Night - Sky Brightness Monitoring Network

    Science.gov (United States)

    Cheung, Sze Leung; Pun, Jason Chun Shing; SO, Chu-wing; Shibata, Yukiko; Walker, Constance Elaine; Agata, Hidehiko

    2015-08-01

    The Global at Night - Sky Brightness Monitoring Network (GaN-MN) is an international project for long-term monitoring of night sky conditions around the world. The GaN-MN consists of fixed monitoring stations each equipped with a Sky Quality Meter - Lensed Ethernet (SQM-LE), which is a specialized light sensor for night sky brightness (NSB) measurement. NSB data are continuously collected at high sampling frequency throughout the night, and these data will be instantly made available to the general public to provide a real-time snapshot of the global light pollution condition. A single data collection methodology, including data sampling frequency, data selection criteria, device design and calibration, and schemes for data quality control, was adopted to ensure uniformity in the data collected. This is essential for a systematic and global study of the level of light pollution. The data collected will also provide the scientific backbone in our efforts to contribute to dark sky conservation through education to the general public and policy makers. The GaN-MN project is endorsed by the IAU IYL Executive Committee Working Group as a major Cosmic Light program in the International Year of Light.

  20. Mechanical electrodeposition of bright nanocrystalline nickel

    Institute of Scientific and Technical Information of China (English)

    ZHU ZengWei; ZHU Di; QU NingSong

    2008-01-01

    A new mechanical electrodeposition technology was proposed,and nanocrystal-line nickel deposit with bright and smooth surface was prepared in the bath without any additive agents.Unlike traditional methods,the novel technology employed dynamical hard particles to continuously polish the cathode surface and disturb the nearby solution during electrodepositing.Experimental results showed that the polishing effect of hard particles can effectively prevent the hydrogen bubbles and impurities from adhering on the deposit surface and avoid the production of pits,pinholes and nodules.Furthermore,comparing with the deposit prepared by tradi-tional methods,the one prepared by the novel technology was substantially refined with grain size ranging from 30 to 80 nm.Every diffraction peak's intensity of the deposit was reduced,the preferential orientation degree of (200) decreased and those of (111) and (220) increased.The microhardness notably increased.The magnetic properties were also changed with decreased saturation magnetization and increased coercive force.It was also found that variation of current density and cathode rotational speed could affect the structure and properties of the nickel deposits prepared by this technology.Key.words:electrodeposition,electroforming,hard particle,nanocrystalline,bright nickel deposits prepared by this technology.

  1. High Brightness Neutron Source for Radiography. Final report

    International Nuclear Information System (INIS)

    This research and development program was designed to improve nondestructive evaluation of large mechanical objects by providing both fast and thermal neutron sources for radiography. Neutron radiography permits inspection inside objects that x-rays cannot penetrate and permits imaging of corrosion and cracks in low-density materials. Discovering of fatigue cracks and corrosion in piping without the necessity of insulation removal is possible. Neutron radiography sources can provide for the nondestructive testing interests of commercial and military aircraft, public utilities and petrochemical organizations. Three neutron prototype neutron generators were designed and fabricated based on original research done at the Lawrence Berkeley National Laboratory (LBNL). The research and development of these generators was successfully continued by LBNL and Adelphi Technology Inc. under this STTR. The original design goals of high neutron yield and generator robustness have been achieved, using new technology developed under this grant. In one prototype generator, the fast neutron yield and brightness was roughly 10 times larger than previously marketed neutron generators using the same deuterium-deuterium reaction. In another generator, we integrate a moderator with a fast neutron source, resulting in a high brightness thermal neutron generator. The moderator acts as both conventional moderator and mechanical and electrical support structure for the generator and effectively mimics a nuclear reactor. In addition to the new prototype generators, an entirely new plasma ion source for neutron production was developed. First developed by LBNL, this source uses a spiral antenna to more efficiently couple the RF radiation into the plasma, reducing the required gas pressure so that the generator head can be completely sealed, permitting the possible use of tritium gas. This also permits the generator to use the deuterium-tritium reaction to produce 14-MeV neutrons with increases

  2. Influence of sputtering pressure on the structural, optical and hydrophobic properties of sputtered deposited HfO{sub 2} coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dave, V. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Dubey, P. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Gupta, H.O. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Chandra, R. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India)

    2013-12-31

    The aim of this work is to develop hydrophobic coatings for outdoor insulators using sputtering technique. Hafnium oxide is characterized by high dielectric constant, large band gap (5.6 eV), high refractive index (2.1) and good mechanical, thermal and chemical properties. Hence HfO{sub 2} is suitable as a protective coating for outdoor insulators used in the transmission line and transformers. Hafnium oxide coatings were deposited on glass substrates by DC magnetron sputtering technique at a sputtering pressure of 5 mTorr, 10 mTorr, 15 mTorr, 20 mTorr and 25 mTorr. The deposited films were characterized by techniques like X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle goniometry and UV–vis-NIR spectrophotometer. The average crystallite size calculated from XRD peaks shows that it increases with increase in sputtering pressure up to 15 mTorr and then it starts decreasing. The roughness calculated from AFM images shows the similar trend. The deposited films were found to be hydrophobic and transparent. The hydrophobicity of the films was correlated with the roughness calculated from AFM. The effect of sputtering pressure was also investigated on optical band gap and refractive index calculated from transmission and absorption data. The electrical resistivity was found to be high, thus ensuring insulating property of the deposited films. - Highlights: • Outdoor Insulators are suffering from environment pollution problem. • To mitigate problem, hydrophobic coating of HfO{sub 2} was synthesized by DC sputtering. • Effect of sputtering pressure was studied on structural, optical and hydrophobic properties of HfO{sub 2} • Optimum results were obtained at a sputtering pressure of 15 mTorr.

  3. Influence of sputtering pressure on the structural, optical and hydrophobic properties of sputtered deposited HfO2 coatings

    International Nuclear Information System (INIS)

    The aim of this work is to develop hydrophobic coatings for outdoor insulators using sputtering technique. Hafnium oxide is characterized by high dielectric constant, large band gap (5.6 eV), high refractive index (2.1) and good mechanical, thermal and chemical properties. Hence HfO2 is suitable as a protective coating for outdoor insulators used in the transmission line and transformers. Hafnium oxide coatings were deposited on glass substrates by DC magnetron sputtering technique at a sputtering pressure of 5 mTorr, 10 mTorr, 15 mTorr, 20 mTorr and 25 mTorr. The deposited films were characterized by techniques like X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle goniometry and UV–vis-NIR spectrophotometer. The average crystallite size calculated from XRD peaks shows that it increases with increase in sputtering pressure up to 15 mTorr and then it starts decreasing. The roughness calculated from AFM images shows the similar trend. The deposited films were found to be hydrophobic and transparent. The hydrophobicity of the films was correlated with the roughness calculated from AFM. The effect of sputtering pressure was also investigated on optical band gap and refractive index calculated from transmission and absorption data. The electrical resistivity was found to be high, thus ensuring insulating property of the deposited films. - Highlights: • Outdoor Insulators are suffering from environment pollution problem. • To mitigate problem, hydrophobic coating of HfO2 was synthesized by DC sputtering. • Effect of sputtering pressure was studied on structural, optical and hydrophobic properties of HfO2 • Optimum results were obtained at a sputtering pressure of 15 mTorr

  4. INVESTIGATION ON THE CAUSES OF EUCALYPTUS KRAFT PULP BRIGHTNESS REVERSION

    Directory of Open Access Journals (Sweden)

    Kátia M. M. Eiras

    2005-12-01

    Full Text Available Some high brightness eucalyptus Kraft pulps have shown poor brightness stability. In most cases, the causes have notbeen identified and permanent solutions have not been found. This work focused on evaluating the brightness stability profile of pulpsbleached by in sequences such as O(DC(PODD, O(DC(PODP, OD(PODD, OD(PODP, ODHT(PODD, ODHT(PODP, OA/D(PODD, OA/D(PODP, OAD(PODD and O(ZeD(PO. Brightness stability tests induced by according to Tappi UM200 procedureon samples bleached to 90±0.5% ISO. Brightness stability was measured after each bleaching stage of the various sequences andexpressed as brightness loss in % ISO. The results indicate that pulps bleached with sequences ending with a peroxide stage havehigher brightness stability compared to those ending with a chlorine dioxide stage. Pulps bleached with a standard sequence, initiatingwith a (DC stage, show brightness stability similar to that of pulp bleached by an ECF (Elementary chlorine free sequence initiatingwith a regular D0 stage. ECF sequences, initiated with hot stages produce pulps with higher brightness stability than sequencesinitiating with a regular D0 stage. The profile across the bleaching sequences shows a tendency of increased brightness stability inalkaline stages containing peroxide and decreased stability in those stages containing chlorine and/or chlorine dioxide, parallelingpulp carbonyl group content.

  5. Characterization of helium/argon working gas systems in a radiofrequency glow discharge atomic emission source. Part I: Optical emission, sputtering and electrical characteristics

    Science.gov (United States)

    Christopher, Steven J.; Hartenstein, Matthew L.; Marcus, R. Kenneth; Belkin, Mikhail; Caruso, Joseph A.

    1998-08-01

    Studies are performed to determine the influence of discharge gas composition (helium/argon working gas mixtures) on the analyte emission signal intensities, sputtering rates, and DC-bias characteristics of an analytical radiofrequency glow discharge atomic emission spectroscopy (RF-GD-AES) source. As the partial pressure of He is increased from 0 to 15 torr, increased emission intensity is observed for a range of bulk and trace elements in NIST 1250 SRM (low alloy steel), regardless of the base pressure of Ar in the source (5 and 9 torr). In contrast to increases in analyte emission intensity of up to 300%, counterindicative decreases in the sputtering rates on the order of about 30-50% are observed. The magnitude of these effects depends on both the partial pressure of helium introduced to the source and the total pressure of the He and Ar gases. Use of relative emission yield (REY) to normalize changes in emission intensity to sputtering rates indicates that excitation efficiencies increase under these conditions. Increases in average electron energy and temperature appear to control this response. Decreases in both analyte emission intensities and sputter rates occur with increasing He partial pressure when the total pressure in the cell remains fixed (11 torr in these studies). Emission yields for the fixed pressure, mixed gas plasmas decrease as the partial pressure of He (He/Ar ratio) in the RF-GD source increases. In this case, decreases in electron number densities appear to dictate the lower REYs. Measurement of DC-bias values at the sample surface provide understanding with respect to the observed changes in sputtering rates as well as suggest the origins of changes in plasma electron energetics. Use of a diamond stylus profilometer provides both the quantitative sputter rate information as well as qualitative insights into the use of mixed gas plasmas for enhanced depth profiling capabilities. The analyte emission characteristics of these mixed gas

  6. Numerical evaluation of a 13.5-nm high-brightness microplasma extreme ultraviolet source

    Energy Technology Data Exchange (ETDEWEB)

    Hara, Hiroyuki, E-mail: mt146648@cc.utsunomiya-u.ac.jp; Arai, Goki; Dinh, Thanh-Hung; Higashiguchi, Takeshi, E-mail: higashi@cc.utsunomiya-u.ac.jp [Department of Electrical and Electronic Engineering, Faculty of Engineering and Center for Optical Research and Education (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 (Japan); Jiang, Weihua [Department of Electrical Engineering, Nagaoka University of Technology, Nagaoka, Niigata 940-2188 (Japan); Miura, Taisuke; Endo, Akira [HiLASE Centre, Institute of Physics CAS, Za radnicí 828, 252 41 Dolní Břežany (Czech Republic); Ejima, Takeo [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai 980-8577 (Japan); Li, Bowen [School of Nuclear Science and Technology, Lanzhou University, Lanzhou 730000 (China); Dunne, Padraig; O' Sullivan, Gerry [School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland); Sunahara, Atsushi [Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871 (Japan)

    2015-11-21

    The extreme ultraviolet (EUV) emission and its spatial distribution as well as plasma parameters in a microplasma high-brightness light source are characterized by the use of a two-dimensional radiation hydrodynamic simulation. The expected EUV source size, which is determined by the expansion of the microplasma due to hydrodynamic motion, was evaluated to be 16 μm (full width) and was almost reproduced by the experimental result which showed an emission source diameter of 18–20 μm at a laser pulse duration of 150 ps [full width at half-maximum]. The numerical simulation suggests that high brightness EUV sources should be produced by use of a dot target based microplasma with a source diameter of about 20 μm.

  7. Status of Plasma Physics Techniques for the Deposition of Tribological Coatings

    Science.gov (United States)

    Spalvins, T.

    1984-01-01

    The plasma physics deposition techniques of sputtering and ion-plating are reviewed. Their characteristics and potentials are discussed in terms of synthesis or deposition of tribological coatings. Since the glow discharge or plasma generated in the conventional sputtering and ion-plating techniques has a low ionization efficiency, rapid advances have been made in equipment design to further increase the ionization efficiency. The enhanced ionization favorably affects the nucleation and growth sequence of the coating. This leads to improved adherence and coherence, higher density, favorable morphological growth, and reduced internal stresses in the coatings. As a result, desirable coating characteristics can be precision tailored. Tribological coating characteristics of sputtered solid film lubricants such as MoS2, ion-plated soft gold and lead metallic films, and sputtered and ion-plated wear-resistant refractory compound films such as nitrides and carbides are discussed.

  8. Estimates of Sputter Yields of Solar-Wind Heavy Ions of Lunar Regolith Materials

    Science.gov (United States)

    Barghouty, Abdulmasser F.; Adams, James H., Jr.

    2008-01-01

    At energies of approximately 1 keV/amu, solar-wind protons and heavy ions interact with the lunar surface materials via a number of microscopic interactions that include sputtering. Solar-wind induced sputtering is a main mechanism by which the composition of the topmost layers of the lunar surface can change, dynamically and preferentially. This work concentrates on sputtering induced by solar-wind heavy ions. Sputtering associated with slow (speeds the electrons speed in its first Bohr orbit) and highly charged ions are known to include both kinetic and potential sputtering. Potential sputtering enjoys some unique characteristics that makes it of special interest to lunar science and exploration. Unlike the yield from kinetic sputtering where simulation and approximation schemes exist, the yield from potential sputtering is not as easy to estimate. This work will present a preliminary numerical scheme designed to estimate potential sputtering yields from reactions relevant to this aspect of solar-wind lunar-surface coupling.

  9. Pulsed magnetron sputtering of alumina films: crystalline phases at low temperatures

    International Nuclear Information System (INIS)

    Medium-frequency-pulsed reactive magnetron sputtering was used to deposit transparent alumina layers of about 5 microns thickness onto X10CrA124 steel substrates.Substrate temperature, plasma density and bias voltage were varied to show their influence on the structure and properties of the deposited alumina layers. At high plasma densities already in the temperature region below 500 deg C partially crystalline γ-Al2O3 was found. With the occurrence of this phase the hardness of the layers increased drastically, from 10 GPa, the value for amorphous alumina, to about 19 GPa. At substrate temperatures above 700 deg C most of the layers completely consist of α-Al2O3 and reach the hardness of the bulk material (corundum: 22 GPa). The variation of plasma density impressively demonstrated the possibility to replace the thermal activation of the reactive deposition of crystalline Al2O3 by a plasma-induced one. (author). 8 refs., 2 figs., 1 photo

  10. High-rate deposition of Ta-doped SnO{sub 2} films by reactive magnetron sputtering using a Sn-Ta metal-sintered target

    Energy Technology Data Exchange (ETDEWEB)

    Muto, Y.; Nakatomi, S.; Oka, N. [Graduate School of Science and Engineering, Aoyama Gakuin Univ., 5-10-1 Fuchinobe, Chuo-ku, Sagamihara, Kanagawa 252-5258 (Japan); Iwabuchi, Y.; Kotsubo, H. [Chemical and Industrial Products Technology Division, Bridgestone Co., 3-1-1 Ogawahigashi, Kodaira, Tokyo 187-8531 (Japan); Shigesato, Y., E-mail: yuzo@chem.aoyama.ac.jp [Graduate School of Science and Engineering, Aoyama Gakuin Univ., 5-10-1 Fuchinobe, Chuo-ku, Sagamihara, Kanagawa 252-5258 (Japan)

    2012-03-01

    Ta-doped SnO{sub 2} films were deposited on glass substrate (either unheated or heated at 200 Degree-Sign C) by reactive magnetron sputtering with a Sn-Ta metal-sintered target using a plasma control unit (PCU) and mid-frequency (mf, 50 kHz) unipolar pulsing. The PCU feedback system precisely controlled the flow of the reactive and sputtering gases (O{sub 2} and Ar, respectively) by monitoring either discharge impedance or the plasma emission of the atomic O* line at 777 nm. The planar target was connected to the switching unit, which was operated in unipolar pulse mode. Power density on the target was maintained at 4.4 W cm{sup -2} during deposition. The lowest obtained resistivity for the films deposited on heated substrate was 6.4 Multiplication-Sign 10{sup -3} {Omega}cm, where the deposition rate was 250 nm min{sup -1}.

  11. Modelling Solar and Stellar Brightness Variabilities

    Science.gov (United States)

    Yeo, K. L.; Shapiro, A. I.; Krivova, N. A.; Solanki, S. K.

    2016-04-01

    Total and spectral solar irradiance, TSI and SSI, have been measured from space since 1978. This is accompanied by the development of models aimed at replicating the observed variability by relating it to solar surface magnetism. Despite significant progress, there remains persisting controversy over the secular change and the wavelength-dependence of the variation with impact on our understanding of the Sun's influence on the Earth's climate. We highlight the recent progress in TSI and SSI modelling with SATIRE. Brightness variations have also been observed for Sun-like stars. Their analysis can profit from knowledge of the solar case and provide additional constraints for solar modelling. We discuss the recent effort to extend SATIRE to Sun-like stars.

  12. Hybrid quantum repeater using bright coherent light.

    Science.gov (United States)

    van Loock, P; Ladd, T D; Sanaka, K; Yamaguchi, F; Nemoto, Kae; Munro, W J; Yamamoto, Y

    2006-06-23

    We describe a quantum repeater protocol for long-distance quantum communication. In this scheme, entanglement is created between qubits at intermediate stations of the channel by using a weak dispersive light-matter interaction and distributing the outgoing bright coherent-light pulses among the stations. Noisy entangled pairs of electronic spin are then prepared with high success probability via homodyne detection and postselection. The local gates for entanglement purification and swapping are deterministic and measurement-free, based upon the same coherent-light resources and weak interactions as for the initial entanglement distribution. Finally, the entanglement is stored in a nuclear-spin-based quantum memory. With our system, qubit-communication rates approaching 100 Hz over 1280 km with fidelities near 99% are possible for reasonable local gate errors.

  13. High brightness angled cavity quantum cascade lasers

    Energy Technology Data Exchange (ETDEWEB)

    Heydari, D.; Bai, Y.; Bandyopadhyay, N.; Slivken, S.; Razeghi, M., E-mail: razeghi@eecs.northwestern.edu [Center for Quantum Devices, Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208 (United States)

    2015-03-02

    A quantum cascade laser (QCL) with an output power of 203 W is demonstrated in pulsed mode at 283 K with an angled cavity. The device has a ridge width of 300 μm, a cavity length of 5.8 mm, and a tilt angle of 12°. The back facet is high reflection coated, and the front facet is anti-reflection coated. The emitting wavelength is around 4.8 μm. In distinct contrast to a straight cavity broad area QCL, the lateral far field is single lobed with a divergence angle of only 3°. An ultrahigh brightness value of 156 MW cm{sup −2 }sr{sup −1} is obtained, which marks the brightest QCL to date.

  14. Brightness temperature for 166 radio sources

    Institute of Scientific and Technical Information of China (English)

    Jun-Hui Fan; Yong Huang; Yu-Hai Yuan; Jiang-He Yang; Yi Liu; Jun Tao; Ying Gao; Tong-Xu Hua; Rui-Guang Lin; Jiang-Shui Zhang; Jing-Yi Zhang; Yi-Ping Qin

    2009-01-01

    Using the database of the University of Michigan Radio Astronomy Observatory (UMRAO) at three radio frequencies (4.8, 8 and 14.5 GHz), we determined the short-term variability timescales for 166 radio sources. The timescales are 0.15d (2007+777) to 176.17d (0528-250) with an average timescale of △tobs=17.1±16.5d for the whole sample. The timescales are used to calculate the brightness temperatures, TB. The value of log TB is in the range of log TB = 10.47 to 19.06 K. In addition, we also estimated the boosting factor for the sources. The correlation between the polarization and the Doppler factor is also discussed.

  15. Tunneling Dynamics Between Atomic Bright Solitons

    CERN Document Server

    Zhao, Li-Chen; Yang, Zhan-Ying; Yang, Wen-Li

    2016-01-01

    We investigate tunneling behavior between two bright solitons in a Bose-Einstein condensate with attractive contact interactions between atoms. The explicit tunneling properties including tunneling particles and oscillation period are described analytically, which indicates that the periodic tunneling form is a nonlinear Josephson type oscillation. The results suggest that the breathing behavior of solitons comes from the tunneling mechanism in an effective double-well potential, which is quite different from the modulational instability mechanism for Akhmediev breather and K-M breather. Furthermore, we obtain a phase diagram for two soliton interaction which admits tunneling property, particle-like property, interference property, and a resonant interaction case. The explicit conditions for them are clarified based on the defined critical distance $d_c$ and spatial interference period $D$.

  16. Considerations for high-brightness electron sources

    International Nuclear Information System (INIS)

    Particle accelerators are now used in many areas of physics research and in industrial and medical applications. New uses are being studied to address major societal needs in energy production, materials research, generation of intense beams of radiation at optical and suboptical wavelengths, treatment of various kinds of waste, and so on. Many of these modern applications require a high intensity beam at the desired energy, along with a very good beam quality in terms of the beam confinement, aiming, or focusing. Considerations for ion and electron accelerators are often different, but there are also many commonalties, and in fact, techniques derived for one should perhaps more often be considered for the other as well. We discuss some aspects of high-brightness electron sources here from that point of view. 6 refs

  17. Dark Skies, Bright Kids Year 7

    Science.gov (United States)

    Bittle, Lauren E.; Johnson, Kelsey E.; Borish, H. Jacob; Burkhardt, Andrew; Firebaugh, Ariel; Hancock, Danielle; Rochford Hayes, Christian; Linden, Sean; Liss, Sandra; Matthews, Allison; Prager, Brian; Pryal, Matthew; Sokal, Kimberly R.; Troup, Nicholas William; Wenger, Trey

    2016-01-01

    We present updates from our seventh year of operation including new club content, continued assessments, and our fifth annual Star Party. Dark Skies, Bright Kids (DSBK) is an entirely volunteer-run outreach organization based out of the Department of Astronomy at the University of Virginia. Our core mission is to enhance elementary science education and literacy in Central Virginia through fun, hands-on activities that introduce basic Astronomy concepts. Our primary focus is hosting an 8-10 week after-school astronomy club at underserved elementary and middle schools. Each week, DSBK volunteers take the role of coaches to introduce astronomy-related concepts ranging from the Solar System to galaxies to astrobiology, and to lead students in interactive learning activities. Another hallmark of DSBK is hosting our Annual Central Virginia Star Party, a free event open to the community featuring star-gazing and planetarium shows.

  18. Preparation and characterization of Ag-coated cenospheres by magnetron sputtering method

    International Nuclear Information System (INIS)

    In this paper, we show the feasibility of the magnetron sputtering deposition technique to grow 10-100-nm thick, uniform, continuous and well adhesive silver films on cenosphere particles so that the properties of the core particles can be suitably modified. Experiments were conducted with a magnetron sputtering deposition system in which a newly designed sample stage equipped with an ultrasonic vibration generator was used for the tumbling of cenosphere particles. The cenosphere particles are characterized by X-ray diffraction (XRD) analysis, field emission scanning electron microscope (FE-SEM) and inductively coupled plasma-atom emission spectrometer (ICP-AES) before and after the coating process. All results show the metal film has been successfully coated onto cenosphere particles. Under the given conditions, up to 3.0 wt.% silver was deposited on cenosphere particles measured by ICP-AES. The FE-SEM results indicate that at the micro-scale the relatively uniform, compact and well adhesive silver films with about 51 nm thickness were successfully deposited on cenosphere particles. The XRD analytic result indicates that the nanometer metal film has a face-centered cubic structure

  19. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  20. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field.

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process.

  1. Novel high power impulse magnetron sputtering enhanced by an auxiliary electrical field.

    Science.gov (United States)

    Li, Chunwei; Tian, Xiubo

    2016-08-01

    The high power impulse magnetron sputtering (HIPIMS) technique is a novel highly ionized physical vapor deposition method with a high application potential. However, the electron utilization efficiency during sputtering is rather low and the metal particle ionization rate needs to be considerably improved to allow for a large-scale industrial application. Therefore, we enhanced the HIPIMS technique by simultaneously applying an electric field (EF-HIPIMS). The effect of the electric field on the discharge process was studied using a current sensor and an optical emission spectrometer. Furthermore, the spatial distribution of the electric potential and electric field during the EF-HIPIMS process was simulated using the ANSYS software. The results indicate that a higher electron utilization efficiency and a higher particle ionization rate could be achieved. The auxiliary anode obviously changed the distribution of the electric potential and the electric field in the discharge region, which increased the plasma density and enhanced the degree of ionization of the vanadium and argon gas. Vanadium films were deposited to further compare both techniques, and the morphology of the prepared films was investigated by scanning electron microscopy. The films showed a smaller crystal grain size and a denser growth structure when the electric field was applied during the discharge process. PMID:27587123

  2. Moon night sky brightness simulation for the Xinglong station

    International Nuclear Information System (INIS)

    Using a sky brightness monitor at the Xinglong station of National Astronomical Observatories, Chinese Academy of Sciences, we collected data from 22 dark clear nights and 90 moon nights. We first measured the sky brightness variation with time for dark nights and found a clear correlation between sky brightness and human activity. Then with a modified sky brightness model of moon nights and data from these nights, we derived the typical value for several important parameters in the model. With these results, we calculated the sky brightness distribution under a given moon condition for the Xinglong station. Furthermore, we simulated the sky brightness distribution of a moon night for a telescope with a 5° field of view (such as LAMOST). These simulations will be helpful for determining the limiting magnitude and exposure time, as well as planning the survey for LAMOST during moon nights

  3. Influence of the sputtering pressure on the properties of transparent conducting zirconium-doped zinc oxide films prepared by RF magnetron sputtering

    Institute of Scientific and Technical Information of China (English)

    刘汉法; 张化福; 类成新; 袁长坤

    2009-01-01

    Transparent conducting zirconium-doped zinc oxide films with high transparency and relatively low re-sistivity have been successfully prepared on water-cooled glass substrate by radio frequency magnetron sputtering at room temperature. The Ar sputtering pressure was varied from 0.5 to 3 Pa. The crystallinity increases and the electri-cal resistivity decreases when the sputtering pressure increases from 0.5 to 2.5 Pa. The cystallinity decreases and the electrical resistivity increases when the sputtering pressure increases from 2.5 to 3 Pa. When the sputtering pressure The deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrate.

  4. Annular bright and dark field imaging of soft materials

    International Nuclear Information System (INIS)

    Here polyethylene, as an example of an important soft material, was studied by STEM annular bright and dark field. The contrast as function of the probe size/shape and the detector collection angle are discussed. The results are compared to conventional bright field transmission electron microscopy, electron energy filtered imaging and energy dispersive spectroscopy mapping. Annular bright and dark field gave a higher contrast than conventional transmission and analytical mapping techniques

  5. Variability, Brightness Temperature, Superluminal Motion, Doppler Boosting, and Related Issues

    CERN Document Server

    Kellermann, K I

    2003-01-01

    We review the observations of rapid flux density variations in compact radio sources, and discuss the inverse Compton limit to the maximum brightness temperature of incoherent synchrotron sources in comparison with recent VLBA observations. The apparent agreement of the theoretical brightness temperature limit due to inverse Compton cooling and the brightness temperatures observed by early VLBI observations appears to have been fortuitous. VLBA observations have greatly improved the quality of the data, but many of the early issues remain unresolved.

  6. Research on Brightness Measurement of Intense Electron Beam

    CERN Document Server

    Wang, Yuan; Zhang, Huang; Yang, GuoJun; Li, YiDing; Li, Jin

    2015-01-01

    The mostly research fasten on high emission density of injector to study electron beam's brightness in LIA. Using the injector(2MeV) was built to research brightness of multi-pulsed high current(KA) electron beam, and researchs three measurement method (the pepper-pot method, beam collimator without magnetic field, beam collimator with magnetic field method) to detect beam's brightness with time-resolved measurement system.

  7. Sputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays

    Energy Technology Data Exchange (ETDEWEB)

    Banakh, Oksana, E-mail: oksana.banakh@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Moussa, Mira, E-mail: mira.moussa@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Matthey, Joel, E-mail: joel.matthey@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Pontearso, Alessandro, E-mail: alessandro.pontearso@he-arc.ch [Institute of Applied Microtechnologies, Haute Ecole Arc Ingénierie (HES-SO), Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds (Switzerland); Cattani-Lorente, Maria, E-mail: maria.cattani-lorente@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Sanjines, Rosendo, E-mail: rosendo.sanjines@epfl.ch [Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Condensed Matter Physics, Station 3, CH-1015 Lausanne (Switzerland); Fontana, Pierre, E-mail: Pierre.Fontana@hcuge.ch [Haemostasis laboratory, Geneva University Hospital, Rue Gabrielle-Perret-Gentil 4, CH-1205 Geneva (Switzerland); Wiskott, Anselm, E-mail: anselm.wiskott@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland); Durual, Stephane, E-mail: stephane.durual@unige.ch [Laboratory of Biomaterials, University of Geneva, 19, rue Barthelemy Menn, CH-1205 Geneva (Switzerland)

    2014-10-30

    Highlights: • Titanium oxynitride coatings (TiN{sub x}O{sub y}) with chemical composition ranging from TiN to TiO{sub 2} were deposited by magnetron sputtering from a metallic Ti target using a mixture of O{sub 2} + N{sub 2}. • The coatings structure as well as physical, chemical and mechanical properties progressively changes as a function of oxygen content in the TiN{sub x}O{sub y.} • All TiN{sub x}O{sub y} coatings show a significantly higher level of bioactivity as compared to bare Ti substrates (1.2 to 1.4 fold increase in cell proliferation). Despite variations in surface chemistry, topography and surface tension observed on films as a function of chemical composition, no significant differences in the films’ biological activity were observed after 3 days of testing. - Abstract: Titanium oxynitride coatings (TiN{sub x}O{sub y}) are considered a promising material for applications in dental implantology due to their high corrosion resistance, their biocompatibility and their superior hardness. Using the sputtering technique, TiN{sub x}O{sub y} films with variable chemical compositions can be deposited. These films may then be set to a desired value by varying the process parameters, that is, the oxygen and nitrogen gas flows. To improve the control of the sputtering process with two reactive gases and to achieve a variable and controllable coating composition, the plasma characteristics were monitored in-situ by optical emission spectroscopy. TiN{sub x}O{sub y} films were deposited onto commercially pure (ASTM 67) microroughened titanium plates by reactive magnetron sputtering. The nitrogen gas flow was kept constant while the oxygen gas flow was adjusted for each deposition run to obtain films with different oxygen and nitrogen contents. The physical and chemical properties of the deposited films were analyzed as a function of oxygen content in the titanium oxynitride. The potential application of the coatings in dental implantology was assessed by

  8. High-surface-quality nanocrystalline InN layers deposited on GaN templates by RF sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Valdueza-Felip, Sirona; Naranjo, Fernando B.; Gonzalez-Herraez, Miguel [Grupo de Ingenieria Fotonica, Departamento de Electronica, Escuela Politecnica Superior, Universidad de Alcala, Campus Universitario, 28871 Alcala de Henares, Madrid (Spain); Lahourcade, Lise; Monroy, Eva [Equipe mixte CEA-CNRS-UJF, Nanophysique et Semiconducteurs, INAC/SP2M/PSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Fernandez, Susana [Departamento de Energias Renovables, Energia Solar Fotovoltaica, Centro de Investigaciones Energeticas, Medioambientales y Tecnologicas (CIEMAT), Avda. Complutense 22, 28040 Madrid (Spain)

    2011-01-15

    We report a detailed study of the effect of deposition parameters on optical, structural, and morphological properties of InN films grown by reactive radio-frequency (RF) sputtering on GaN-on-sapphire templates in a pure nitrogen atmosphere. Deposition parameters under study are substrate temperature, RF power, and sputtering pressure. Wurtzite crystallographic structure with c-axis preferred growth orientation is confirmed by X-ray diffraction measurements. For the optimized deposition conditions, namely at a substrate temperature of 450 C and RF power of 30 W, InN films present a root-mean-square surface roughness as low as {proportional_to}0.4 nm, comparable to the underlying substrate. The apparent optical bandgap is estimated at 720 nm (1.7 eV) in all cases. However, the InN absorption band tail is strongly influenced by the sputtering pressure due to a change in the species of the plasma. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  9. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-01

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (˜35-60 at nm-3) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

  10. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering.

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-20

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%. PMID:25627862

  11. STEM-EELS analysis reveals stable high-density He in nanopores of amorphous silicon coatings deposited by magnetron sputtering.

    Science.gov (United States)

    Schierholz, Roland; Lacroix, Bertrand; Godinho, Vanda; Caballero-Hernández, Jaime; Duchamp, Martial; Fernández, Asunción

    2015-02-20

    A broad interest has been showed recently on the study of nanostructuring of thin films and surfaces obtained by low-energy He plasma treatments and He incorporation via magnetron sputtering. In this paper spatially resolved electron energy-loss spectroscopy in a scanning transmission electron microscope is used to locate and characterize the He state in nanoporous amorphous silicon coatings deposited by magnetron sputtering. A dedicated MATLAB program was developed to quantify the helium density inside individual pores based on the energy position shift or peak intensity of the He K-edge. A good agreement was observed between the high density (∼35-60 at nm(-3)) and pressure (0.3-1.0 GPa) values obtained in nanoscale analysis and the values derived from macroscopic measurements (the composition obtained by proton backscattering spectroscopy coupled to the macroscopic porosity estimated from ellipsometry). This work provides new insights into these novel porous coatings, providing evidence of high-density He located inside the pores and validating the methodology applied here to characterize the formation of pores filled with the helium process gas during deposition. A similar stabilization of condensed He bubbles has been previously demonstrated by high-energy He ion implantation in metals and is newly demonstrated here using a widely employed methodology, magnetron sputtering, for achieving coatings with a high density of homogeneously distributed pores and He storage capacities as high as 21 at%.

  12. Growth and characterization of alpha-Cr2O3 thin films prepared by reactive AC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Khanna, Atul [University of Arkansas; Bhat, Deepak [University of Arkansas; Payzant, E Andrew [ORNL

    2006-01-01

    Cr2O3 thin films were prepared on silicon and glass substrates by mid frequency AC sputtering technique in an Isoflux ICM-10 sputter deposition system consisting of two hollow cylindrical targets of Cr in argon-oxygen plasma and at a discharge power of 5 kW. Thin film samples were deposited on three silicon and one glass substrate. X-ray diffraction studies showed that the coatings were ?-phase Cr2O3. One coating sample grown on a Si substrate was annealed in air up to a maximum temperature of 900 oC. While the heat treatment increased the crystallite size and sharpened the XRD peaks ?-Cr2O3 was thermally stable and did not show any structural transformations. Scanning electron microscopy studies showed differences in the surface morphology of the coatings grown on glass and silicon substrates. Dynamic SIMS measurements performed on one coating deposited on silicon showed that thin films had O/Cr ratio of 1.38. Alumina coatings were deposited on Si substrates by reactive sputtering technique using Cr2O3 coatings as template layers. XRD investigations showed that Cr2O3 template layers improved the crystallinity of alumina coatings grown on top of it and also facilitated the formation of thermodynamically stable alpha-alumina phase.

  13. Effect of sputtering target's grain size on the sputtering yield, particle size and coercivity (Hc) of Ni and Ni20Al thin films

    Science.gov (United States)

    Reza, M.; Sajuri, Z.; Yunas, J.; Syarif, J.

    2016-02-01

    Researches on magnetic thin films concentrated mainly on optimizing the sputtering parameters to obtain the desired thin film's properties. However, the effect of the sputtering target's properties towards the thin film's properties is not well established. This study is focused on analysing the effect of sputtering target's grain size towards the sputtering yield, particle size and the magnetic coercivity (Hc) of thin film. Two sets of sputtering targets; pure Ni (magnetic) and Ni20Al (at.%) (non-magnetic) were prepared. Each target has 2 sets of samples with different grain sizes; (a) 30 to 50μm and (b) 80 to 100μm. Thin films from each target were sputtered onto glass substrates under fixed sputtering parameters. The initial results suggested that the sputtering target's grain size has significant effect on the thin film's sputtering yield, particle size and Hc. Sputtering target with smaller grain size has 12% (pure Ni) to 60% (Ni20Al) higher sputtering yield, which produces thin films with smaller particle size and larger Hc value. These initial findings provides a basis for further magnetic thin film research, particularly for the seed layer in hard disk drive (HDD) media, where seed layer with smaller particle size is essential in reducing signal-to-noise ratio (SNR).

  14. Optical-emission studies on the interaction between halogenated carbon species and noble gas during fluoropolymer sputtering

    Science.gov (United States)

    Sugimoto, Iwao; Miyake, Shojiro

    1989-06-01

    Using optical-emission spectroscopy, the interaction between metastable-excited noble gas and fluorocarbon species is investigated for poly-chloro-tri-fluoro-ethylene (PCTFE) sputtering under a mixture of noble gas and CF3Cl gas flow conditions. Among a variety of noble gases, He and Ne in an excited state were quenched through energy transfer which induced the ionization and self-decomposition of the halogenated carbon species. Such an inactivation was not observed in the Ar, Kr, and Xe cases, in accordance with the ionization energy in CF3Cl derived from photoelectron spectroscopy. Instability in a radio-frequency (rf) plasma was observed in the pure Xe case. However, the plasma was stabilized in the case of a mixture with CF3Cl. The CF2 band which is characteristic of PCTFE sputtering was not detected in the Xe case. In addition, it was confirmed that the oxygen introduced into the rf plasma was more likely to react with CF2(3B1) than with CF2(1B1) or CF3(1B1).

  15. INVESTIGATION ON THE CAUSES OF EUCALYPTUS KRAFT PULP BRIGHTNESS REVERSION

    OpenAIRE

    Kátia M. M. Eiras; Jorge Luiz Colodette; Ana Márcia M. L. Carvalho

    2005-01-01

    Some high brightness eucalyptus Kraft pulps have shown poor brightness stability. In most cases, the causes have notbeen identified and permanent solutions have not been found. This work focused on evaluating the brightness stability profile of pulpsbleached by in sequences such as O(DC)(PO)DD, O(DC)(PO)DP, OD(PO)DD, OD(PO)DP, ODHT(PO)DD, ODHT(PO)DP, OA/D(PO)DD, OA/D(PO)DP, OAD(PO)DD and O(Ze)D(PO). Brightness stability tests induced by according to Tappi UM200 procedureon samples bleached to...

  16. Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride coatings

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Pengfei, E-mail: wangpf@szu.edu.cn [Institute of Nanosurface Science and Engineering, College of Mechatronics and Control Engineering, Shenzhen University, Shenzhen 518060 (China); Institute of Fluid Science, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan); Takeno, Takanori [Laboratory of Nanointerface Engineering, Division of Mechanical Engineering, Tohoku University, Aoba 6-6-1, Aramaki, Aoba-ku, Sendai 980-8579 (Japan); Fontaine, Julien [Laboratoire de Tribologie et Dynamique des Systèmes, UMR 5513 – CNRS/Ecole Centrale de Lyon, Bâtiment H10, 36 Avenue Guy de Collongue, 69134 Écully Cedex (France); Aono, Masami [Department of Materials Science and Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686 (Japan); Adachi, Koshi [Laboratory of Nanointerface Engineering, Division of Mechanical Engineering, Tohoku University, Aoba 6-6-1, Aramaki, Aoba-ku, Sendai 980-8579 (Japan); Miki, Hiroyuki [Center for Interdisciplinary Research, Tohoku University, Aoba 6-3, Aramaki, Aoba-ku, Sendai 980-8578 (Japan); Takagi, Toshiyuki [Institute of Fluid Science, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan)

    2014-06-01

    Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride (CN{sub x}) coatings are investigated. CN{sub x} coatings are fabricated by a hybrid coating process with the combination of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) and DC magnetron sputtering at various substrate bias voltage and target sputtering power in the order of −400 V 200 W, −400 V 100 W, −800 V 200 W, and −800 V 100 W. The deposition rate, N/C atomic ratio, and hardness of CN{sub x} coatings as well as friction coefficient of CN{sub x} coating sliding against AISI 52100 pin in N{sub 2} gas stream decrease, while the residual stress of CN{sub x} coatings increases with the increase of substrate bias voltage and the decrease of target sputtering power. The highest hardness measured under single stiffness mode of 15.0 GPa and lowest residual stress of 3.7 GPa of CN{sub x} coatings are obtained at −400 V 200 W, whereas the lowest friction coefficient of 0.12 of CN{sub x} coatings is achieved at −800 V 100 W. Raman and XPS analysis suggest that sp{sup 3} carbon bonding decreases and sp{sup 2} carbon bonding increases with the variations in substrate bias voltage and target sputtering power. Optical images and Raman characterization of worn surfaces confirm that the friction behavior of CN{sub x} coatings is controlled by the directly sliding between CN{sub x} coating and steel pin. Therefore, the reduction of friction coefficient is attributed to the decrease of sp{sup 3} carbon bonding in the CN{sub x} coating. It is concluded that substrate bias voltage and target sputtering power are effective parameters for tailoring the structural and tribological properties of CN{sub x} coatings. - Highlights: • Various CN{sub x} coatings are produced using a unique hybrid coating process. • Structural and tribological properties of CN{sub x} coatings are investigated. • The lowest friction

  17. Analysis of a tungsten sputtering experiment in DIII-D and code/data validation of high redeposition/reduced erosion

    International Nuclear Information System (INIS)

    We analyze a DIII-D tokamak experiment where two tungsten spots on the removable DiMES divertor probe were exposed to 12 s of attached plasma conditions, with moderate strike point temperature and density (~20 eV, ~4.5 x1019 m-3), and 3% carbon impurity content. Both very small (1 mm diameter) and small (1 cm diameter) deposited samples were used for assessing gross and net tungsten sputtering erosion. The analysis uses a 3-D erosion/redeposition code package (REDEP/WBC), with input from a diagnostic-calibrated near-surface plasma code (OEDGE), and with focus on charge state resolved impinging carbon ion flux and energy. The tungsten surfaces are primarily sputtered by the carbon, in charge states +1 to +4. We predict high redeposition (~75%) of sputtered tungsten on the 1 cm spot–with consequent reduced net erosion–and this agrees well with post-exposure DiMES probe RBS analysis data. As a result, this study and recent related work is encouraging for erosion lifetime and non-contamination performance of tokamak reactor high-Z plasma facing components

  18. EMI shielding using composite materials with two sources magnetron sputtering

    Science.gov (United States)

    Ziaja, J.; Jaroszewski, M.; Lewandowski, M.

    2016-02-01

    In this study, the preparation composite materials for electromagnetic shields using two sources magnetron sputtering DC-M is presented. A composite material was prepared by coating a nonwoven polypropylene metallic layer in sputtering process of targets Ti (purity 99%) and brass alloy MO58 (58%Cu, 40%Zn, 2%Pb) and ϕ diameter targets = 50 mm, under argon atmosphere. The system with magnetron sputtering sources was powered using switch-mode power supply DPS (Dora Power System) with a maximum power of 16 kW and a maximum voltage of 1.2 kV with group frequency from 50 Hz to 5 kHz. The influence of sputtering time of individual targets on the value of the EM field attenuation SE [dB] was investigated for the following supply conditions: pressure pp = 2x10-3 Torr, sputtering power P = 750 W, the time of applying a layer t = 5 min, group frequency fg = 2 kHz, the frequency of switching between targets fp = 1 Hz.

  19. Projectile charge state dependent sputtering of solid surfaces

    CERN Document Server

    Hayderer, G

    2000-01-01

    dependence on the ion kinetic energy. This new type of potential sputtering not only requires electronic excitation of the target material, but also the formation of a collision cascade within the target in order to initiate the sputtering process and has therefore been termed kinetically assisted potential sputtering. In order to study defects induced by potential sputtering on the atomic scale we performed measurements of multiply charged Ar ion irradiated HOPG (highly oriented pyrolitic graphite) samples with scanning tunneling microscopy (STM). The only surface defects found in the STM images are protrusions. The mean diameter of the defects increases with projectile charge state while the height of the protrusions stays roughly the same indicating a possible pre-equilibrium effect of the stopping of slow multiply charged projectiles in HOPG. Total sputter yields for impact of slow singly and multiply charged ions on metal- (Au), oxide- (Al2O3, MgO) and alkali-halide surfaces (LiF) have been measured as a...

  20. Larger Planet Radii Inferred from Stellar "Flicker" Brightness Variations of Bright Planet Host Stars

    CERN Document Server

    Bastien, Fabienne A; Pepper, Joshua

    2014-01-01

    Most extrasolar planets have been detected by their influence on their parent star, typically either gravitationally (the Doppler method) or by the small dip in brightness as the planet blocks a portion of the star (the transit method). Therefore, the accuracy with which we know the masses and radii of extrasolar planets depends directly on how well we know those of the stars, the latter usually determined from the measured stellar surface gravity, logg. Recent work has demonstrated that the short-timescale brightness variations ("flicker") of stars can be used to measure logg to a high accuracy of ~0.1-0.2 dex (Bastien et al. 2013). Here, we use flicker measurements of 289 bright (Kepmag<13) candidate planet-hosting stars with Teff=4500-6650 K to re-assess the stellar parameters and determine the resulting impact on derived planet properties. This re-assessment reveals that for the brightest planet-host stars, an astrophysical bias exists that contaminates the stellar sample with evolved stars: nearly 50%...

  1. Co-sputtered oxide thin film encapsulated organic electronic devices with prolonged lifetime

    Energy Technology Data Exchange (ETDEWEB)

    Wong, F.L.; Fung, M.K.; Ng, C.Y.; Ng, A.; Bello, I.; Lee, S.T.; Lee, C.S., E-mail: apcslee@cityu.edu.hk

    2011-11-30

    Effective top-side thin film encapsulation for organic light-emitting devices (OLEDs) was achieved by deposition of a multi-layer water diffusion barrier stack to protect the device against moisture permeation. The barrier stack was formed by alternative depositions of co-oxide and fluorocarbon (CF{sub x}) films. The co-oxide layer was fabricated by magnetron co-sputtering of silicon dioxide (SiO{sub 2}) and aluminum oxide (Al{sub 2}O{sub 3}). While the CF{sub x} layer was formed by plasma enhanced chemical vapor deposition. The water vapor transmission rate of the optimized diffusion barrier stack can be down to 10{sup -6} g/m{sup 2}/day. The OLEDs encapsulated with the multilayer stack have been shown to have operation lifetime of over 18,000 h which is nearly the same as devices with conventional glass-cover encapsulation.

  2. Operation of a Segmented Hall Thruster with Low-sputtering Carbon-velvet Electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Raitses, Y.; Staack, D.; Dunaevsky, A.; Fisch, N.J.

    2005-12-01

    Carbon fiber velvet material provides exceptional sputtering resistance properties exceeding those for graphite and carbon composite materials. A 2 kW Hall thruster with segmented electrodes made of this material was operated in the discharge voltage range of 200–700 V. The arcing between the floating velvet electrodes and the plasma was visually observed, especially, during the initial conditioning time, which lasted for about 1 h. The comparison of voltage versus current and plume characteristics of the Hall thruster with and without segmented electrodes indicates that the magnetic insulation of the segmented thruster improves with the discharge voltage at a fixed magnetic field. The observations reported here also extend the regimes wherein the segmented Hall thruster can have a narrower plume than that of the conventional nonsegmented thruster.

  3. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

    Science.gov (United States)

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-01-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed. PMID:25852353

  4. Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

    Science.gov (United States)

    Majeed, Asif; He, Jie; Jiao, Lingrui; Zhong, Xiaoxia; Sheng, Zhengming

    2015-01-01

    Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

  5. Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro

    Science.gov (United States)

    Petrantoni, M.; Rossi, C.; Salvagnac, L.; Conédéra, V.; Estève, A.; Tenailleau, C.; Alphonse, P.; Chabal, Y. J.

    2010-10-01

    Multilayered Al/CuO thermite was deposited by a dc reactive magnetron sputtering method. Pure Al and Cu targets were used in argon-oxygen gas mixture plasma and with an oxygen partial pressure of 0.13 Pa. The process was designed to produce low stress (<50 MPa) multilayered nanoenergetic material, each layer being in the range of tens nanometer to one micron. The reaction temperature and heat of reaction were measured using differential scanning calorimetry and thermal analysis to compare nanostructured layered materials to microstructured materials. For the nanostructured multilayers, all the energy is released before the Al melting point. In the case of the microstructured samples at least 2/3 of the energy is released at higher temperatures, between 1036 and 1356 K.

  6. Effects of nitrogen ion implantation time on tungsten films deposited by DC magnetron sputtering on AISI 410 martensitic stainless steel

    Science.gov (United States)

    Malau, Viktor; Ilman, Mochammad Noer; Iswanto, Priyo Tri; Jatisukamto, Gaguk

    2016-03-01

    Nitrogen ion implantation time on tungsten thin film deposited on surface of AISI 410 steel has been performed. Tungsten thin film produced by dc magnetron sputtering method was deposited on AISI 410 martensitic stainless steel substrates, and then the nitrogen ions were implanted on tungsten thin film. The objective of this research is to investigate the effects of implantation deposition time on surface roughness, microhardness, specific wear and corrosion rate of nitrogen implanted on tungsten film. Magnetron sputtering process was performed by using plasma gas of argon (Ar) to bombardier tungsten target (W) in a vacuum chamber with a pressure of 7.6 x 10-2 torr, a voltage of 300 V, a sputter current of 80 mA for sputtered time of 10 minutes. Nitrogen implantation on tungsten film was done with an initial pressure of 3x10-6 mbar, a fluence of 2 x 1017 ions/cm2, an energy of 100 keV and implantation deposition times of 0, 20, 30 and 40 minutes. The surface roughness, microhardness, specific wear and corrosion rate of the films were evaluated by surfcorder test, Vickers microhardness test, wear test and potentiostat (galvanostat) test respectively. The results show that the nitrogen ions implanted deposition time on tungsten film can modify the surface roughness, microhardness, specific wear and corrosion rate. The minimum surface roughness, specific wear and corrosion rate can be obtained for implantation time of 20 minutes and the maximum microhardness of the film is 329 VHN (Vickers Hardness Number) for implantation time of 30 minutes. The specific wear and corrosion rate of the film depend directly on the surface roughness.

  7. Ultra-bright alkylated graphene quantum dots

    Science.gov (United States)

    Feng, Lan; Tang, Xing-Yan; Zhong, Yun-Xin; Liu, Yue-Wen; Song, Xue-Huan; Deng, Shun-Liu; Xie, Su-Yuan; Yan, Jia-Wei; Zheng, Lan-Sun

    2014-10-01

    Highly efficient and stable photoluminescence (PL) are urgently desired for graphene quantum dots (GQDs) to facilitate their prospective applications as optical materials. Here, we report the facile and straightforward synthesis of alkylated graphene quantum dots (AGQDs) via the solvothermal reaction of propagatively alkylated graphene sheets (PAGenes). In contrast to most GQDs reported so far, the synthesized AGQDs process pH-independent and ultra-bright PL with a relative quantum yield of up to 65%. Structural and chemical composition characterization demonstrated that the synthesized AGQDs are nearly oxygen-defect-free with alkyl groups decorated on edges and basal plane, which may contribute to their greatly improved pH tolerance and high quantum efficiency. The photocatalytic performance of AGQDs-P25 nanocomposites was evaluated by the degradation of Rhodamine B under visible light. The photocatalytic rate is ca. 5.9 times higher than that of pure P25, indicating that AGQDs could harness the visible spectrum of sunlight for energy conversion or environmental therapy.Highly efficient and stable photoluminescence (PL) are urgently desired for graphene quantum dots (GQDs) to facilitate their prospective applications as optical materials. Here, we report the facile and straightforward synthesis of alkylated graphene quantum dots (AGQDs) via the solvothermal reaction of propagatively alkylated graphene sheets (PAGenes). In contrast to most GQDs reported so far, the synthesized AGQDs process pH-independent and ultra-bright PL with a relative quantum yield of up to 65%. Structural and chemical composition characterization demonstrated that the synthesized AGQDs are nearly oxygen-defect-free with alkyl groups decorated on edges and basal plane, which may contribute to their greatly improved pH tolerance and high quantum efficiency. The photocatalytic performance of AGQDs-P25 nanocomposites was evaluated by the degradation of Rhodamine B under visible light. The

  8. Electrochromic properties of bipolar pulsed magnetron sputter deposited tungsten–molybdenum oxide films

    International Nuclear Information System (INIS)

    There are great interests in electrochromic technology for smart windows and displays over past decades. In this study, the WMoOx thin films were deposited onto indium tin oxide glass and silicon substrates by pulsed magnetron sputter system with W and Mo targets. The films were deposited with fixed W target power while the variant parameter of Mo target power in the range 50, 100, 150 and 200 W was investigated. The working pressure was fixed at 1.33 Pa with a gas mixture of Ar (30 sccm) and O2 (15 sccm). The film thickness increased with the Mo target power. Higher plasma power resulted in a crystalline structure which would reduce the electrochromic property of the film. The influence of plasma powers applied to Mo target on the structural, optical and electrochromic properties of the WMoOx thin films has been investigated. WMoOx films grown at Mo target powers less than 100 W were found to be amorphous. The films deposited at 150 W, which is the optimal fabrication condition, exhibit better electrochromic properties with high optical modulation, high coloration efficiency and less color memory effect at wavelength 400, 550 and 800 nm. The improvement resulted from the effect of doping Mo has been tested. The maximum ΔT (%) values are 36.6% at 400 nm, 65.6% at 550 nm, and 66.6% at 800 nm for pure WO3 film. The addition of Mo content in the WMoOx films provides better resistance to the short wavelength light source and can be used in the concerned application. - Highlights: • WMoOx films are deposited by pulsed magnetron sputter with pure W and Mo targets. • Mo addition in WMoOx provides better resistance to short wavelength light source. • WMoOx films exhibit electrochemical stability in the cycling test

  9. Oxidation Behaviour of Sputtered Ni-3Cr-20Al Alloy

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    The oxidation behavior of sputtered Ni-3Cr-20Al coating at 900°C in air was investigated. A dense Al2O3 layer was formed on the sputtered Ni-3Cr-20Al coating after 200 h oxidation.However, owing to the segregation of Ni3Al during oxidation Focess at high temperature, the spinel NiAl2O4 was also formed in the Al2O3 layer. It was found that the formation of NiAl2O4had no detrimental effect on the oxidation resistance of the sputtered Ni-3Cr-20Al coating due to the excellent adhesion shown by the Al2O3 and NiAl2O4 complex oxide scale.

  10. Oxygen Recovery in Hf Oxide Films Fabricated by Sputtering

    Institute of Scientific and Technical Information of China (English)

    JIANG Ran; LI Zi-Feng

    2009-01-01

    The chemical structure of ultrathin Hf oxide films (< 10 nm) fabricated by a standard sputtering method is investigated using x-ray spectroscopy and Rutherford backscattering spectroscopy. According to the experiments,oxygen species are impacted to the HfO2/Si interface during the initial sputtering, and then released back to the upper Hf02 region driven by the oxygen concentration grads. A vacuum annealing can greatly enhance this recovery process. Additionally, significant SiO2 reduction in the interface is observed after the vacuum annealing for the thick HfO2 films in our experiment. It might be an effective method to confine the interracial layer thickness by sputtering thick HfO2 in no-oxygen ambient.

  11. Energy dependence of sputtering yields of monatomic solids

    International Nuclear Information System (INIS)

    The experimental data on the sputtering of solids by ion bombardment have been accumulated. This paper presents the compilation of the experimental data on the energy dependence of the sputtering yield at normal incidence for all available combination of incident ions and target atoms. For each combination, the data are fitted to an empirical equation based on the modified Sigmund equation. The best fit values of two empirical parameters are tabulated. The elastic stopping cross section was obtained. The deviation of the experimental values from the best fit curves in remarkable for heavier incident ions and for heavier target atoms. The approximate sputtering yield of any combination as a function of energy is easily obtained. (Kato, T.)

  12. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    P Samarasekara; N U S Yapa; N T R N Kumara; M V K Perera

    2007-04-01

    For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO2 gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8.5 mbar for 18 h. Argon and oxygen gases were used as sputtering and reactive gases, respectively. ZnO phase could be crystallized using a pure metal target of zinc. The structure of the films determined by means of X-ray diffraction method indicates that the zinc oxide single phase can be fabricated in this substrate temperature range. The sensitivity of the film synthesized at substrate temperature of 130°C is 2.17 in the presence of CO2 gas at a measuring temperature of 100°C.

  13. Dark and bright vortex solitons in electromagnetically induced transparent media

    International Nuclear Information System (INIS)

    We show that dark and bright vortex solitons can exist in three-state electromagnetically induced transparent media under some appropriate conditions. We also analyse the stability of the dark and bright vortex solitons. This work may provide other research opportunities in nonlinear optical experiments and may result in a substantial impact on technology

  14. Low dimensional neutron moderators for enhanced source brightness

    DEFF Research Database (Denmark)

    Mezei, Ferenc; Zanini, Luca; Takibayev, Alan;

    2014-01-01

    for cold neutrons. This model leads to the conclusions that the optimal shape for high brightness para-hydrogen neutron moderators is the quasi 1-dimensional tube and these low dimensional moderators can also deliver much enhanced cold neutron brightness in fission reactor neutron sources, compared...

  15. Surface photometry of bulge dominated low surface brightness galaxies

    NARCIS (Netherlands)

    Beijersbergen, M; de Blok, WJG; van der Hulst, JM

    1999-01-01

    We present results of broad band BVRI observations of a sample of galaxies with a low surface brightness (LSB) disk and a bulge. These galaxies are well described as exponential disks and exponential bulges with no preferred value for either scale length or central surface brightness. The median B b

  16. Analysis of Bright Harvest Remote Analysis for Residential Solar Installations

    Energy Technology Data Exchange (ETDEWEB)

    Nangle, John [National Renewable Energy Lab. (NREL), Golden, CO (United States); Simon, Joseph [National Renewable Energy Lab. (NREL), Golden, CO (United States)

    2015-06-17

    Bright Harvest provides remote shading analysis and design products for residential PV system installers. The National Renewable Energy Laboratory (NREL) through the NREL Commercialization Assistance Program, completed comparative assessments between on-site measurements and remotely calculated values to validate the accuracy of Bright Harvest’s remote shading and power generation.

  17. Modular Zero Energy. BrightBuilt Home

    Energy Technology Data Exchange (ETDEWEB)

    Aldrich, Robb [Consortium for Advanced Residential Buildings (CARB), Norwalk, CT (United States). Steven Winters Associates, Inc.; Butterfield, Karla [Consortium for Advanced Residential Buildings (CARB), Norwalk, CT (United States). Steven Winters Associates, Inc.

    2016-03-01

    Kaplan Thompson Architects (KTA) has specialized in sustainable, energy-efficient buildings, and they have designed several custom, zero-energy homes in New England. These zero-energy projects have generally been high-end, custom homes with budgets that could accommodate advanced energy systems. In an attempt to make zero energy homes more affordable and accessible to a larger demographic, KTA explored modular construction as way to provide high-quality homes at lower costs. In the mid-2013, KTA formalized this concept when they launched BrightBuilt Home (BBH). The BBH mission is to offer a line of architect-designed, high-performance homes that are priced to offer substantial savings off the lifetime cost of a typical home and can be delivered in less time. For the past two years, CARB has worked with BBH and Keiser Homes (the primary modular manufacturer for BBH) to discuss challenges related to wall systems, HVAC, and quality control. In Spring of 2014, CARB and BBH began looking in detail on a home to be built in Lincolnville, ME by Black Bros. Builders. This report details the solution package specified for this modular plan and the challenges that arose during the project.

  18. Lyman Alpha Mapping Project (LAMP) Brightness Maps

    Science.gov (United States)

    Retherford, Kurt D.; Gladstone, G.; Stern, S.; Egan, A. F.; Miles, P. F.; Parker, J. W.; Greathouse, T. K.; Davis, M. W.; Slater, D. C.; Kaufmann, D. E.; Versteeg, M. H.; Feldman, P. D.; Hurley, D. M.; Pryor, W. R.; Hendrix, A. R.

    2010-10-01

    The Lyman Alpha Mapping Project (LAMP) is an ultraviolet (UV) spectrograph on the Lunar Reconnaissance Orbiter (LRO) that is designed to map the lunar albedo at far-UV wavelengths. LAMP primarily measures interplanetary Hydrogen Lyman-alpha sky-glow and far-UV starlight reflected from the night-side lunar surface, including permanently shadowed regions (PSRs) near the poles. Dayside observations are also obtained. Brightness maps sorted by wavelength (including the Lyman-alpha wavelength of 121.6 nm) are reported for the polar regions, with a few regions of interest reported in more detail. LAMP's spectral range of 58 nm to 196 nm includes a water ice spectral feature near 160 nm, which provides a diagnostic tool for detecting water on the lunar surface that is complementary to recent discoveries using infrared and radio frequency techniques. Progress towards producing far-UV albedo maps and searching for water ice signatures will be reported. We'll discuss how LAMP data may address questions regarding how water is formed on the moon, transported through the lunar atmosphere, and deposited in the PSRs.

  19. Dark Skies, Bright Kids Year 6

    Science.gov (United States)

    Liss, Sandra; Troup, Nicholas William; Johnson, Kelsey E.; Barcos-Munoz, Loreto D.; Beaton, Rachael; Bittle, Lauren; Borish, Henry J.; Burkhardt, Andrew; Corby, Joanna; Dean, Janice; Hancock, Danielle; King, Jennie; Prager, Brian; Romero, Charles; Sokal, Kimberly R.; Stierwalt, Sabrina; Wenger, Trey; Zucker, Catherine

    2015-01-01

    Now entering our sixth year of operation, Dark Skies, Bright Kids (DSBK) is an entirely volunteer-run outreach organization based out of the Department of Astronomy at the University of Virginia. Our core mission is to enhance elementary science education and literacy in central Virginia through fun, hands-on activities that introduce basic Astronomy concepts beyond Virginia's Standards of Learning. Our primary focus is hosting an 8-10 week after-school astronomy club at underserved elementary and middle schools. Each week, DSBK volunteers take the role of coaches to introduce astronomy-related concepts ranging from the Solar System to galaxies to astrobiology, and to lead students in interactive learning activities. Another hallmark of DSBK is hosting our Annual Central Virginia Star Party, a free event open to the community featuring star-gazing and planetarium shows.DSBK has amassed over 15,000 contact hours since 2009 and we continue to broaden our impact. One important step we have taken in the past year is to establish a graduate student led assessment program to identify and implement directed learning goals for DSBK outreach. The collection of student workbooks, observations, and volunteer surveys indicates broad scale success for the program both in terms of student learning and their perception of science. The data also reveal opportunities to improve our organizational and educational practices to maximize student achievement and overall volunteer satisfaction for DSBK's future clubs and outreach endeavors.

  20. Mechanical electrodeposition of bright nanocrystalline nickel

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    A new mechanical electrodeposition technology was proposed, and nanocrystalline nickel deposit with bright and smooth surface was prepared in the bath without any additive agents. Unlike traditional methods, the novel technology employed dynamical hard particles to continuously polish the cathode surface and disturb the nearby solution during electrodepositing. Experimental results showed that the polishing effect of hard particles can effectively prevent the hydrogen bubbles and impurities from adhering on the deposit surface and avoid the production of pits, pinholes and nodules. Furthermore, comparing with the deposit prepared by traditional methods, the one prepared by the novel technology was substantially refined with grain size ranging from 30 to 80 nm. Every diffraction peak’s intensity of the deposit was reduced, the preferential orientation degree of (200) decreased and those of (111) and (220) increased. The microhardness notably increased. The magnetic properties were also changed with decreased saturation magnetization and increased coercive force. It was also found that variation of current density and cathode rotational speed could affect the structure and properties of the nickel deposits prepared by this technology.

  1. Antilensing: the bright side of voids.

    Science.gov (United States)

    Bolejko, Krzysztof; Clarkson, Chris; Maartens, Roy; Bacon, David; Meures, Nikolai; Beynon, Emma

    2013-01-11

    More than half of the volume of our Universe is occupied by cosmic voids. The lensing magnification effect from those underdense regions is generally thought to give a small dimming contribution: objects on the far side of a void are supposed to be observed as slightly smaller than if the void were not there, which together with conservation of surface brightness implies net reduction in photons received. This is predicted by the usual weak lensing integral of the density contrast along the line of sight. We show that this standard effect is swamped at low redshifts by a relativistic Doppler term that is typically neglected. Contrary to the usual expectation, objects on the far side of a void are brighter than they would be otherwise. Thus the local dynamics of matter in and near the void is crucial and is only captured by the full relativistic lensing convergence. There are also significant nonlinear corrections to the relativistic linear theory, which we show actually underpredicts the effect. We use exact solutions to estimate that these can be more than 20% for deep voids. This remains an important source of systematic errors for weak lensing density reconstruction in galaxy surveys and for supernovae observations, and may be the cause of the reported extra scatter of field supernovae located on the edge of voids compared to those in clusters. PMID:23383886

  2. Chromatic variations suppress suprathreshold brightness variations.

    Science.gov (United States)

    Kingdom, Frederick A A; Bell, Jason; Gheorghiu, Elena; Malkoc, Gokhan

    2010-01-01

    Most objects in natural scenes are suprathreshold in both color (chromatic) and luminance contrast. How salient is each dimension? We have developed a novel method employing a stimulus similar to that used by B. C. Regan and J. D. Mollon (1997) who studied the relative saliencies of the two chromatic cardinal directions. Our stimuli consist of left- and right-oblique modulations of color and/or luminance defined within a lattice of circles. In the "separated" condition, the two modulations were presented separately as forced-choice pairs, and the task was to indicate which was more salient. In the "combined" condition, the two orthogonal-in-orientation modulations were added, and the task was to indicate the more salient orientation. The ratio of color to luminance contrast at the PSE was calculated for both conditions. Across color directions, 48% more luminance contrast relative to color contrast was required to achieve a PSE in the "combined" compared to the "separated" condition. A second experiment showed that the PSE difference was due to the luminance being masked by the color, rather than due to superior color grouping. We conclude that suprathreshold brightness variations are masked by suprathreshold color variations. PMID:20884478

  3. Intercomparisons of Nine Sky Brightness Detectors

    Directory of Open Access Journals (Sweden)

    Henk Spoelstra

    2011-10-01

    Full Text Available Nine Sky Quality Meters (SQMs have been intercompared during a night time measurement campaign held in the Netherlands in April 2011. Since then the nine SQMs have been distributed across the Netherlands and form the Dutch network for monitoring night sky brightness. The goal of the intercomparison was to infer mutual calibration factors and obtain insight into the variability of the SQMs under different meteorological situations. An ensemble average is built from the individual measurements and used as a reference to infer the mutual calibration factors. Data required additional synchronization prior to the calibration determination, because the effect of moving clouds combined with small misalignments emerges as time jitter in the measurements. Initial scatter of the individual instruments lies between ±14%. Individual night time sums range from −16% to +20%. Intercalibration reduces this to 0.5%, and −7% to +9%, respectively. During the campaign the smallest luminance measured was 0.657 ± 0.003 mcd/m2 on 12 April, and the largest value was 5.94 ± 0.03 mcd/m2 on 2 April. During both occurrences interfering circumstances like snow cover or moonlight were absent.

  4. The Los Alamos high-brightness photoinjector

    Energy Technology Data Exchange (ETDEWEB)

    O' Shea, P.G.

    1991-01-01

    For a number of years Los Alamos National Laboratory has been developing photocathode RF guns for high-brightness electron beam applications such as free-electron lasers (FELs). Previously thermionic high-voltage guns have been the source of choice for the electron accelerators used to drive FELs. The performance of such FELs is severely limited by the emittance growth produced by the subharmonic bunching process and also by the low peak current of the source. In a photoinjector, a laser driven photocathode is placed directly in a high-gradient RF accelerating cavity. A photocathode allows unsurpassed control over the current, and the spatial and temporal profile of the beam. In addition the electrodeless emission'' avoids many of the difficulties associated with multi-electrode guns, i.e. the electrons are accelerated very rapidly to relativistic energies, and there are no electrodes to distort the accelerating fields. For the past two years we have been integrating a photocathode into our existing FEL facility by replacing our thermionic gun and subharmonic bunchers with a high-gradient 1.3 GHz photoinjector. The photoinjector, which is approximately 0.6 m in length, produces 6 MeV, 300 A, 15 ps linac, and accelerated to a final energy of 40 MeV. We have recently begun lasing at wavelengths near 3 {mu}m. 16 refs., 2 figs., 5 tabs.

  5. Improving Efficiency of Diamond Thin Film Deposition In an ECR Sputter Source

    Science.gov (United States)

    Newby, Michael; Ross, Jerry; Zwicker, Andrew

    2010-11-01

    Having some of the most extreme physical properties of any material, diamond thin films are used to reinforce vacuum windows, as a semiconductor in electronic devices and to coat knives among other things. In our experiment, a 5 KW microwave ignites Argon or Hydrogen-Methane gas to create plasma at a low pressure which sputters a graphite target to create a diamond thin film on silicon substrates. The microwave matching system used to do this has an output frequency of 2.45GHz which is sent through a SmartMatch AX3060 impedance matching tuner. The SmartMatch uses three tuning stubs to match the load impedance and optimize the microwave power into the plasma. Problems arise when the SmartMatch tunes to something other than the plasma, such as the o-rings at the quartz window vacuum interface. This project focused on troubleshooting these issues by enabling the control of and communication with the microwave matching system.

  6. Interpreting Central Surface Brightness and Color Profiles in Elliptical Galaxies

    Science.gov (United States)

    Silva, David R.; Wise, Michael W.

    1996-01-01

    Hubble Space Telescope imagery has revealed dust features in the central regions of many (50%--80%) nearby bright elliptical galaxies. If these features are an indication of an underlying smooth diffuse dust distribution, then the interpretation of central surface brightness and color profiles in elliptical galaxies becomes significantly more difficult. In this Letter, diagnostics for constraining the presence of such an underlying central dust distribution are presented. We show that easily detectable central color gradients and flattened central surface brightness profiles can be induced by even small amounts of smoothly distributed dust (~100 M⊙). Conversely, combinations of flat surface brightness profiles and flat color gradients or steep surface brightness profiles and steep color gradients are unlikely to be caused by dust. Taken as a whole, these results provide a simple observational tautology for constraining the existence of smooth diffuse dust distributions in the central regions of elliptical galaxies.

  7. Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges

    International Nuclear Information System (INIS)

    High power impulse magnetron sputtering (HIPIMS) is a plasma vapour deposition technique used for deposition of dense coatings. In order to contribute to a better understanding of the dynamics of a HIPIMS plasma discharge, time- and wavelength-resolved measurements of the light emitted from the plasma were performed. Lateral images of the HIPIMS plasma were recorded using an ICCD camera with a gate width of 1 µs. For each picture, Abel inversion was performed to compute the radial emissivity profile of the plasma. Band-pass interference filters were used to isolate the desired wavelength in order to observe lines of ions and neutrals of metal and argon (Ar) in HIPIMS plasma discharges with an aluminium (Al), titanium (Ti) or chromium (Cr) target in Ar atmosphere. The result is the temporal evolution of the radial emissivity profile of metal and gas neutrals and singly charged ions. (paper)

  8. Study of the Active Screen Plasma Nitriding

    Institute of Scientific and Technical Information of China (English)

    Zhao Cheng; C. X. Li; H. Dong; T. Bell

    2004-01-01

    Active screen plasma nitriding (ASPN) is a novel nitriding process, which overcomes many of the practical problems associated with the conventional DC plasma nitriding (DCPN). Experimental results showed that the metallurgical characteristics and hardening effect of 722M24 steel nitrided by ASPN at both floating potential and anodic (zero) potential were similar to those nitrided by DCPN. XRD and high-resolution SEM analysis indicated that iron nitride particles with sizes in sub-micron scale were deposited on the specimen surface in AS plasma nitriding. These indicate that the neutral iron nitride particles, which are sputtered from the active screen and transferred through plasma to specimen surface, are considered to be the dominant nitrogen carder in ASPN. The OES results show that NH could not be a critical species in plasma nitriding.

  9. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Zhaoying; Liu, Bingwen; Zhao, Evan; Jin, Ke; Du, Yingge; Neeway, James J.; Ryan, Joseph V.; Hu, Dehong; Zhang, Hongliang; Hong, Mina; Le Guernic, Solenne; Thevuthasan, Suntharampillai; Wang, Fuyi; Zhu, Zihua

    2015-08-01

    For the first time, the use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass, SON68, and layered hole-perovskite oxide thin films were selected as model systems due to their fundamental and practical significance. Our study shows that if the size of analysis areas is same, the highest sputter rate of argon cluster sputtering can be 2-3 times faster than the highest sputter rates of oxygen or cesium sputtering. More importantly, high quality data and high sputter rates can be achieved simultaneously for argon cluster sputtering while this is not the case for cesium and oxygen sputtering. Therefore, for deep depth profiling of insulating samples, the measurement efficiency of argon cluster sputtering can be about 6-15 times better than traditional cesium and oxygen sputtering. Moreover, for a SrTiO3/SrCrO3 bi-layer thin film on a SrTiO3 substrate, the true 18O/16O isotopic distribution at the interface is better revealed when using the argon cluster sputtering source. Therefore, the implementation of an argon cluster sputtering source can significantly improve the measurement efficiency of insulating materials, and thus can expand the application of ToF-SIMS to the study of glass corrosion, perovskite oxide thin films, and many other potential systems.

  10. Heteroepitaxial Ge-on-Si by DC magnetron sputtering

    International Nuclear Information System (INIS)

    The growth of Ge on Si(100) by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C. At lower temperatures (320°C), films are essentially amorphous with isolated nanocrystallites at the Si-Ge interface. A minor oxygen contamination at the interface, developing after ex-situ oxide removal, is not seen to hinder epitaxy. Compensation of dislocation-induced acceptors in Ge by sputtering from n-doped targets is proposed.

  11. Mechanical and structural properties of sputtered Ni/Ti multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Senthil Kumar, M.; Boeni, P.; Tixier, S.; Clemens, D.; Horisberger, M. [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

    1997-09-01

    Ni/Ti bilayers have been prepared by dc-magnetron sputtering in order to study their mechanical and structural properties. A remarkable reduction of stress is observed when the Ni layers are sputtered reactively in argon with a high partial pressure of air. The high angle x-ray diffraction studies show a tendency towards amorphisation of the Ni layers with increasing air flow. The low angle measurements indicate a substantial reduction of interdiffusion resulting in smoother interfaces with increasing air content. (author) 2 figs., 2 refs.

  12. Advances in sputtered and ion plated solid film lubrication

    Science.gov (United States)

    Spalvins, T.

    1985-01-01

    The glow discharge or ion assisted vacuum deposition techniques, primarily sputtering and ion plating, have rapidly emerged and offer great potential to deposit solid lubricants. The increased energizing of these deposition processes lead to improved adherence and coherence, favorable morphological growth, higher density, and reduced residual stresses in the film. These techniques are of invaluable importance where high precision machines tribo-components require very thin, uniform lubricating films (0.2 m), which do not interface with component tolerances. The performance of sputtered MoS2 films and ion plated Au and Pb films are described in terms of film thickness, coefficient of friction, and wear lives.

  13. Inverted spherical ioniser sputter ion source (IS3)

    International Nuclear Information System (INIS)

    The reflected beam sputter ion source has been found to have an inherent need for frequent readjustment of several voltages during use. Its lack of cylindrical symmetry is reflected in the asymmetry of its beam, and the position and shape of the sputtering Cs+ beam have been shown to depend strongly on the Cs+ current because of space charge effects. There has been a tendency for ion source designs starting from a simple concept to be subjected to continual improvement a process which, while improving one feature, often complicates the originally simple concept, and makes operation more complex

  14. Sputtering measurements on CTR materials using Auger electron spectroscopy

    International Nuclear Information System (INIS)

    The sputter yield of Nb, W, C, and Ag by Ar+ in the energy range from 0.5 to 1.5 keV was measured. In addition, the sputter yield for W, C and Ag by H+ at 11.0 keV has been determined. With the exception of carbon, the data are in general agreement with earlier work. For carbon, some discrepancies between the present work and earlier studies are found. It is suggested that major factors contributing to these discrepancies are structural and/or chemical in nature

  15. A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al{sup +} ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Philipp, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

    2015-09-15

    A metal ion source prototype has been developed: a combination of magnetron sputter technology with 2.45 GHz electron cyclotron resonance (ECR) ion source technology—a so called magnetron ECR ion source (MECRIS). An integrated ring-shaped sputter magnetron with an Al target is acting as a powerful metal atom supply in order to produce an intense current of singly charged metal ions. Preliminary experiments show that an Al{sup +} ion current with a density of 167 μA/cm{sup 2} is extracted from the source at an acceleration voltage of 27 kV. Spatially resolved double Langmuir probe measurements and optical emission spectroscopy were used to study the plasma states of the ion source: sputter magnetron, ECR, and MECRIS plasma. Electron density and temperature as well as Al atom density were determined as a function of microwave and sputter magnetron power. The effect of ECR heating is strongly pronounced in the center of the source. There the electron density is increased by one order of magnitude from 6 × 10{sup 9} cm{sup −3} to 6 × 10{sup 10} cm{sup −3} and the electron temperature is enhanced from about 5 eV to 12 eV, when the ECR plasma is ignited to the magnetron plasma. Operating the magnetron at constant power, it was observed that its discharge current is raised from 1.8 A to 4.8 A, when the ECR discharge was superimposed with a microwave power of 2 kW. At the same time, the discharge voltage decreased from about 560 V to 210 V, clearly indicating a higher plasma density of the MECRIS mode. The optical emission spectrum of the MECRIS plasma is dominated by lines of excited Al atoms and shows a significant contribution of lines arising from singly ionized Al. Plasma emission photography with a CCD camera was used to prove probe measurements and to identify separated plasma emission zones originating from the ECR and magnetron discharge.

  16. Co-axial ECR plasma system for radioactive ion implantation

    Energy Technology Data Exchange (ETDEWEB)

    Fortin, M A [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Marion, F [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Stansfield, B [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Paynter, R W [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Sarkar, D [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Sarkissian, A [Plasmionique Inc., 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada); Terreault, B [INRS-EMT (Universite du Quebec), 1650 boul. Lionel Boulet, Varennes, Quebec J3X 1S2 (Canada)

    2005-08-01

    A pulsed, co-axial electron cyclotron resonance (ECR, 2.45 GHz) plasma reactor was designed and tested to demonstrate the feasibility of plasma-based radioactive ion implantation ({sup 32}P radioisotope). The geometry of the reactor was designed to produce an efficient implantation of cylindrical implants. Therefore, the reactor is cylindrical in shape, and is equipped with a cylindrical grid in a co-axial geometry. The plasma is created between the wall and the grid; the plasma surrounds the implant, allowing for a radial implantation. A 1 ms microwave pulse creates a plasma in argon, which sputters material from a radioactive cathode. A fraction of the radioisotopes is then ionized, and the ions are implanted into negatively biased metal samples. The plasma was characterized by means of electrostatic probes, giving spatial evaluations of the electron temperature, plasma potential and electron density. Titanium samples were implanted with {sup 32}P during a study that aimed at optimizing the position of the radioactive sputter cathode in the plasma. From an analysis of the distribution of the radioactive fragments, we deduce that the plasma potential has a marked effect on the ion trajectories. In particular, it provides a more uniform implantation distribution than one would otherwise expect. For plasma densities {approx}8 x 10{sup 10} cm{sup -3}, implantation efficiencies as high as 1% are measured; this is about 100 times higher than conventional beam-line ion implantation.

  17. Study of the chemical sputtering in Tore-Supra; Etude de l'erosion chimique dans le tokamak Tore-Supra

    Energy Technology Data Exchange (ETDEWEB)

    Cambe, A

    2002-06-28

    The work presented in this thesis focuses on the interactions between energetic particles coming from thermonuclear plasma and the inner components of a fusion machine. This interaction induces two major problems: erosion of the wall, and tritium retention. This report treats the erosion of carbon based materials. The first part is devoted to chemical sputtering, that appears to be the principal erosion mechanism, compared to physical sputtering and radiation enhanced sublimation that both can be limited. Chemical sputtering has been studied in situ in the tokamak Tore-Supra for ohmic and lower hybrid (LH) heated discharges, by means of mass spectrometry and optical spectroscopy. We have shown that it is necessary to take into account both methane and heavier hydrocarbons (C{sub 2}D{sub x} and C{sub 3}D{sub y}) in the determination of the chemical sputtering yield. It is found that for the ohmic discharges, the sputtering yield of CD{sub 4} (Y{sub CD4}) is highly flux ({phi}) dependent, showing a variation of the form: Y{sub CD4} {proportional_to} {phi}{sup -0.23}. The experimental study also reveals that an increase of the surface temperature induces an augmentation of Y{sub CD4}. The interpretation and the modelling of the experimental results have been performed with a Monte Carlo code (BBQ. In the second part of this work, we have developed and installed an infrared spectroscopy diagnostic in the 0.8-1.6, {mu}m wavelength range dedicated to the measurement of surface temperature, and the identification of atomic and molecular lines emitted during plasma/wall interactions. In the third part, we present the feasibility study of an in situ tungsten deposition process at low temperature(<80 deg C) in order to suppress the chemical sputtering. This study shows that, with this method call Plasma Assisted Chemical Vapor Deposition (PACVD), we are able to coat the whole inner vessel of a tokamak with 1 {mu}m of tungsten. (author)

  18. Dark Skies, Bright Kids! Year 5

    Science.gov (United States)

    Prager, Brian; Johnson, K. E.; Barcos-Munoz, L. D.; Beaton, R.; Bittle, L.; Borish, H.; Burkhardt, A.; Corby, J.; Damke, G.; Dean, J.; Dorsey, G.; Graninger, D.; Lauck, T.; Liss, S.; Oza, A.; Peacock, S.; Romero, C.; Sokal, K. R.; Stierwalt, S.; Walker, L.; Wenger, T.; Zucker, C.

    2014-01-01

    Our public outreach group Dark Skies, Bright Kids! (DSBK) fosters science literacy in Virginia by bringing a hands-on approach to astronomy that engages children's natural excitement and curiosity. We are an entirely volunteer-run group based out of the Department of Astronomy at the University of Virginia and we enthusiastically utilize astronomy as a 'gateway science.' We create long-term relationships with students during an 8 to 10 week long, after-school astronomy club at under served elementary schools in neighboring counties, and we visited 3 different schools in 2013. Additionally, we organize and participate in science events throughout the community. The fifth year of DSBK was marked by surpassing 10,000 contact hours in Spring 2013 Semester and by ringing in the fall semester with our biggest, most successful star party to date. We hosted the Third Annual Central Virginia Star Party, free and open to the community to encourage families to enjoy astronomy together. Nearly four hundred people of all ages attended, double the number from previous years. Joining with local astronomical societies, we offered an enlightening and exciting night with resources rarely accessible to the public, such as an IR camera and a portable planetarium. With numerous telescopes pointed at the sky, and a beautifully clear night with views of the Milky Way, the International Space Station, and numerous meteors, the star party was a fantastic opportunity to introduce many of our guests to the natural wonders of our night sky and enjoy some of the darkest skies on the eastern seaboard.

  19. MAGNETIC FLUX SUPPLEMENT TO CORONAL BRIGHT POINTS

    Energy Technology Data Exchange (ETDEWEB)

    Mou, Chaozhou; Huang, Zhenghua; Xia, Lidong; Li, Bo; Fu, Hui; Jiao, Fangran; Hou, Zhenyong [Shandong Provincial Key Laboratory of Optical Astronomy and Solar-Terrestrial Environment, Institute of Space Sciences, Shandong University, Weihai, 264209 Shandong (China); Madjarska, Maria S., E-mail: z.huang@sdu.edu.cn [Armagh Observatory, College Hill, Armagh BT61 9DG (United Kingdom)

    2016-02-10

    Coronal bright points (BPs) are associated with magnetic bipolar features (MBFs) and magnetic cancellation. Here we investigate how BP-associated MBFs form and how the consequent magnetic cancellation occurs. We analyze longitudinal magnetograms from the Helioseismic and Magnetic Imager to investigate the photospheric magnetic flux evolution of 70 BPs. From images taken in the 193 Å passband of the Atmospheric Imaging Assembly (AIA) we dermine that the BPs’ lifetimes vary from 2.7 to 58.8 hr. The formation of the BP MBFs is found to involve three processes, namely, emergence, convergence, and local coalescence of the magnetic fluxes. The formation of an MBF can involve more than one of these processes. Out of the 70 cases, flux emergence is the main process of an MBF buildup of 52 BPs, mainly convergence is seen in 28, and 14 cases are associated with local coalescence. For MBFs formed by bipolar emergence, the time difference between the flux emergence and the BP appearance in the AIA 193 Å passband varies from 0.1 to 3.2 hr with an average of 1.3 hr. While magnetic cancellation is found in all 70 BPs, it can occur in three different ways: (I) between an MBF and small weak magnetic features (in 33 BPs); (II) within an MBF with the two polarities moving toward each other from a large distance (34 BPs); (III) within an MBF whose two main polarities emerge in the same place simultaneously (3 BPs). While an MBF builds up the skeleton of a BP, we find that the magnetic activities responsible for the BP heating may involve small weak fields.

  20. Dark Skies, Bright Kids! Year 3

    Science.gov (United States)

    Whelan, David G.; Johnson, K. E.; Barcos-Munoz, L. D.; Beaton, R. L.; Borish, J.; Corby, J. F.; Dorsey, G.; Gugliucci, N. E.; Prager, B. J.; Ries, P. A.; Romero, C. E.; Sokal, K. R.; Tang, X.; Walker, L. M.; Yang, A. J.; Zasowski, G.

    2012-01-01

    Dark Skies, Bright Kids! (DSBK) is a program that brings astronomy education to elementary schools throughout central Virginia. In a relaxed, out-of-classroom atmosphere, we are able to foster the innate curiosity that young students have about science and the world around them. We target schools that are under-served due to their rural locale or special needs students, demonstrating that science is a fun and creative process to a segment of the population that might not otherwise be exposed to astronomy. Families are included in the learning experience during semi-annual `star parties'. Since last January, we have expanded the breadth and depth of our educational capabilities. We have developed new programs for use in our digital planetarium. We held the first Central Virginia Star Party, providing an atmosphere where local children from multiple schools were able to share their love for astronomy. Local government and University officials were also invited so that they could experience our focused science outreach. Most recently, we have become part of Ivy Creek School's Club Day activities, bringing our program to a new segment of the elementary school system in Albemarle County: those that have `low-incidence' disabilities, requiring special attention. We continue to develop a curriculum for after-school programs that functions as either a series of one-time activities or several months of focused outreach at one school. Many of these activities are provided on our website, http://www.astro.virginia.edu/dsbk/, for the wider astronomical community, including the new planetarium work. We have extended our book project to include two bilingual astronomy books called `Snapshots of the Universe,' one in Spanish and English, the other in French and English. These books introduce young people to some of the many wonders of the Universe through art and captions developed by DSBK volunteers.

  1. Dark Skies, Bright Kids! Year 4

    Science.gov (United States)

    Sokal, Kimberly R.; Johnson, K. E.; Barcos-Munoz, L. D.; Beaton, R.; Borish, J.; Crawford, S. B.; Corby, J.; Damke, G.; Dean, J.; Dorsey, G.; Jackson, L.; Liss, S.; Oza, A.; Peacock, S.; Prager, B.; Romero, C.; Sivakoff, G. R.; Walker, L.; Whelan, D. G.; Zucker, C.

    2013-01-01

    Aiming to engage young children's natural excitement and curiosity, the outreach group Dark Skies, Bright Kids (DSBK) brings a hands-on approach to astronomy to elementary schools in Virginia. We hope to enhance children's view and understanding of science while exploring the Universe using fun activities. DSBK focuses on rural and underserved schools in Albemarle County and offers a semester-long astronomy club for third through fifth grade students. We believe regular interactions foster personal relationships between students and volunteers that encourage a life-long interest in science. In our fourth year of hosting clubs, we returned to Ivy Creek Elementary School, where we saw wonderful responses from a special group of students with `low-incidence' disabilities. DSBK has grown to realize a broader reach beyond local astronomy clubs; we hope to ignite a spark of interest in astronomy and science more widely- in more children, their families, and their teachers. We also hosted the Second Annual Central Virginia Star Party with an open invitation to the community to encourage families to enjoy astronomy together. Throughout the year, DSBK now holds 'one-off' programs (akin to astronomy field days) for elementary schools and children's groups throughout Virginia. Furthermore, we are in the final stages of a project to create two bilingual astronomy books called "Snapshots of the Universe", in Spanish and French with English translations. This art book will be made available online and we are working to get a copy in every elementary school in the state. DSBK has begun to reach out to elementary school teachers in order to provide them with useful and engaging classroom material. We have adapted our volunteer-created activities into useful and ready-to-use lessons, available online. After improvements based on research through interactions and feedback from teachers, we have explicitly identified the learning goals in terms of Virginia's Standards of Learning

  2. Influence of Oxygen in Sputtering and Annealing Processes on Properties of ZnO:Ag Films Deposited by rf Sputtering

    Institute of Scientific and Technical Information of China (English)

    DUAN Li; GAO Wei

    2011-01-01

    ZnO:Ag films were prepared by rf sputtering on Si substrates.A detailed study on as-grown and annealed films was carried out using x-ray diffraction(XRD).The results indicate that the film crystalline quality and the Ag doping efficiency were both influenced by oxygen in the sputtering and annealing atmosphere.The optimum conditions are found. Ultraviolet and green emissions of annealed ZnO:Ag films were observed at room temperature.Photoluminescence results show that oxygen in annealing atmosphere reduces the deep-level defects in ZnO:Ag and increases the film quality .

  3. Plasma theory

    International Nuclear Information System (INIS)

    A series of lectures on plasma theory with the main headings: introduction; charged particles moving in em fields; the liquid model; transport phenomena in the plasma; wave propagation in plasmas; plasma instabilities. 57 figs. (qui)

  4. 2D edge plasma modeling extended up to the main chamber

    Energy Technology Data Exchange (ETDEWEB)

    Dekeyser, W., E-mail: wouter.dekeyser@mech.kuleuven.be [Department of Mechanical Engineering, Katholieke Universiteit Leuven, Celestijnenlaan 300A, 3001 Leuven (Belgium); Baelmans, M. [Department of Mechanical Engineering, Katholieke Universiteit Leuven, Celestijnenlaan 300A, 3001 Leuven (Belgium); Reiter, D.; Boerner, P.; Kotov, V. [Institut fuer Plasmaphysik, Forschungszentrum Juelich GmbH, EURATOM-Association, Trilateral Euregio Cluster, D-52425 Juelich (Germany)

    2011-08-01

    Far SOL plasma flow, and hence main chamber recycling and plasma surface interaction, are today still only very poorly described by current 2D fluid edge codes, such as B2, UEDGE or EDGE2D, due to a common technical limitation. We have extended the B2 plasma fluid solver in the current ITER version of B2-EIRENE (SOLPS4.3) to allow plasma solutions to be obtained up to the 'real vessel wall', at least on the basis of ad hoc far SOL transport models. We apply here the kinetic Monte Carlo Code EIRENE on such plasma solutions to study effects of this model refinement on main chamber fluxes and sputtering, for an ITER configuration. We show that main chamber sputtering may be significantly modified both due to thermalization of CX neutrals in the far SOL and poloidally highly asymmetric plasma wall contact, as compared to hitherto applied teleportation of particle fluxes across this domain.

  5. Lightweight Target Generates Bright, Energetic X-Rays

    Energy Technology Data Exchange (ETDEWEB)

    Hazi, A

    2006-01-25

    Radiography with x rays is a long-established method to see inside objects, from human limbs to weapon parts. Livermore scientists have a continuing need for powerful x rays for such applications as backlighting, or illuminating, inertial confinement fusion (ICF) experiments and imaging still or exploding materials for the nation's Stockpile Stewardship Program. X-radiography is one of the prime diagnostics for ICF experiments because it captures the fine detail needed to determine what happens to nearly microscopic targets when they are compressed by laser light. For example, Livermore scientists participating in the National Ignition Facility's (NIF's) 18-month-long Early Light experimental campaign, which ended in 2004, used x rays to examine hydrodynamic instabilities in jets of plasma. In these experiments, one laser beam irradiated a solid target of titanium, causing it to form a high-temperature plasma that generated x rays of about 4.65 kiloelectronvolts (keV). These x rays backlit a jet of plasma formed when two other laser beams hit a plastic ablator and sent a shock to an aluminum washer. Livermore physicist Kevin Fournier of the Physics and Advanced Technologies Directorate leads a team that is working to increase the efficiency of converting laser energy into x rays so the resulting images provide more information about the object being illuminated. The main characteristics of x-ray sources are energy and brightness. ''As experimental targets get larger and as compression of the targets increases, the backlighter sources must be brighter and more energetic'', says Fournier. The more energetic the x rays, the further they penetrate an object. The brighter the source--that is, the more photons it has--the clearer the image. historically, researchers have used solid targets such as thin metal foils to generate x rays. however, when photon energies are greater than a few kiloelectronvolts, the conversion efficiency of

  6. Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information.

    Science.gov (United States)

    Wang, Zhaoying; Liu, Bingwen; Zhao, Evan W; Jin, Ke; Du, Yingge; Neeway, James J; Ryan, Joseph V; Hu, Dehong; Zhang, Kelvin H L; Hong, Mina; Le Guernic, Solenne; Thevuthasan, Suntharampilai; Wang, Fuyi; Zhu, Zihua

    2015-08-01

    The use of an argon cluster ion sputtering source has been demonstrated to perform superiorly relative to traditional oxygen and cesium ion sputtering sources for ToF-SIMS depth profiling of insulating materials. The superior performance has been attributed to effective alleviation of surface charging. A simulated nuclear waste glass (SON68) and layered hole-perovskite oxide thin films were selected as model systems because of their fundamental and practical significance. Our results show that high sputter rates and accurate interfacial information can be achieved simultaneously for argon cluster sputtering, whereas this is not the case for cesium and oxygen sputtering. Therefore, the implementation of an argon cluster sputtering source can significantly improve the analysis efficiency of insulating materials and, thus, can expand its applications to the study of glass corrosion, perovskite oxide thin film characterization, and many other systems of interest.

  7. Improvement in surface properties with TiN thin film coating on plasma nitride austenitic 316 stainless steel

    OpenAIRE

    Pankaj Kumar Singh; Arbind Kumar; Sanjay Kumar Sinha; Aman Aggarwal; Gajendra Prasad Singh

    2016-01-01

    The surface of the austenitic 316 stainless steel was modified by using two processes, i.e, dc glow discharge plasma and RF magnetron sputtering. The plasma nitriding was carried out at 500°C under 3 mbar pressure for 5 h in presence of 4N2:1H2 gas mixture. A thin layer of TiN was coated on plasma nitrided samples by using RF magnetron sputtering.The phase formation, nitride layer, surface nanohardness and corrosion current density were evaluated by X-ray diffractogram, optical microscope and...

  8. Quantitative Brightness Analysis of Fluorescence Intensity Fluctuations in E. Coli.

    Directory of Open Access Journals (Sweden)

    Kwang-Ho Hur

    Full Text Available The brightness measured by fluorescence fluctuation spectroscopy specifies the average stoichiometry of a labeled protein in a sample. Here we extended brightness analysis, which has been mainly applied in eukaryotic cells, to prokaryotic cells with E. coli serving as a model system. The small size of the E. coli cell introduces unique challenges for applying brightness analysis that are addressed in this work. Photobleaching leads to a depletion of fluorophores and a reduction of the brightness of protein complexes. In addition, the E. coli cell and the point spread function of the instrument only partially overlap, which influences intensity fluctuations. To address these challenges we developed MSQ analysis, which is based on the mean Q-value of segmented photon count data, and combined it with the analysis of axial scans through the E. coli cell. The MSQ method recovers brightness, concentration, and diffusion time of soluble proteins in E. coli. We applied MSQ to measure the brightness of EGFP in E. coli and compared it to solution measurements. We further used MSQ analysis to determine the oligomeric state of nuclear transport factor 2 labeled with EGFP expressed in E. coli cells. The results obtained demonstrate the feasibility of quantifying the stoichiometry of proteins by brightness analysis in a prokaryotic cell.

  9. The lowest spatial frequency channel determines brightness perception.

    Science.gov (United States)

    Perna, A; Morrone, M C

    2007-05-01

    This study investigates the role played by individual spatial scales in determining the apparent brightness of greyscale patterns. We measured the perceived difference in brightness across an edge in the presence of notch filtering and high-pass filtering for two stimulus configurations, one that elicits the perception of transparency and one that appears opaque. For both stimulus configurations, the apparent brightness of the surfaces delimited by the border decreased monotonically with progressive (ideal) high-pass filtering, with a critical cut-off at 1 c/deg. Using two octave ideal notch filtering, the maximum detrimental effect on apparent brightness was observed at about 1c/deg. Critical frequencies for apparent brightness did not vary with contrast, viewing distance, or surface size, suggesting that apparent brightness is determined by the channel tuned at 1 c/deg. Modelling the data with the local energy model [Morrone, M. C., & Burr, D. C. (1988). Feature detection in human vision: a phase dependent energy model. Proceedings of the Royal Society (London), B235, 221-245] at 1c/deg confirmed the suggestion that this channel mediates apparent brightness for both opaque and transparent borders, with no need for pooling or integration across spatial channels. PMID:17395237

  10. Sputtering of solid neon by keV hydrogen ions

    DEFF Research Database (Denmark)

    Ellegaard, Ole; Schou, Jørgen; Sørensen, H.

    1986-01-01

    Sputtering of solid Ne with the hydrogen ions H+1, H+2 and H+3 in the energy range 1–10 keV/atom has been studied by means of a quartz microbalance technique. No enhancement in the yield per atom for molecular ions was found. The results for hydrogen ions are compared with data for keV electrons....

  11. Sodium tungsten bronze thin films by rf sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anderegg, J.W.

    1977-03-01

    Polycrystalline Na/sub x/WO/sub 3/ films were produced by rf sputtering. Films of low x-value resulted when co-sputtering WO/sub 3/ on a Na/sub 0.83/WO/sub 3/ target, and Na/sub 0/./sub 83/ on WO/sub 3/ target. Films of high x and of mixed phase were produced by sputtering a powder mixture of Na/sub 2/WO/sub 4/ and WO/sub 3/ on a tungsten target. Of the sputtering parameters studied, the substrate temperature is the most critical with temperatures above 500/sup 0/C producing films which were cubic in structure with only a small amount of Tetragonal I. The presence of oxygen up to 3 percent by volume had minimal effect on film quality or x-value. Auger, electron microprobe, SIMS, SEM, x-ray diffraction, and sheet resistivity techniques were used in characterizing these films. Resistivity of the films was a factor of 10 higher than the bulk crystalline data for Na/sub 0/./sub 83/WO/sub 3/.

  12. Sputtered thin films for high density tape recording

    NARCIS (Netherlands)

    Nguyen, L.T.

    2004-01-01

    This thesis describes the investigation of sputtered thin film media for high density tape recording. As discussed in Chapter 1, to meet the tremendous demand of data storage, the density of recording tape has to be increased continuously. For further increasing the bit density the key factors are:

  13. Some New Views on the Principles of Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHAO Jia-xue; FANG Kai-ming; TONG Hong-hui

    2004-01-01

    In this paper, some common phenomena in magnetron sputtering are freshly analyzed and discussed on the basis of the motion of electrons in non-uniform orthogonal electric and magnetic fields. There exist magnetic confinements in three spatial dimensions on moving charged particles (including electrons) in this kind of non-uniform field. They are the longitudinal cycloidal motion, the horizontal simple harmonic-like motion (with varying amplitudes), and the vertical repelling action. The horizontal magnetic confinement in a mirror-like magnetic field keeps glow discharge lane completely parallel to the corridor of magnetic force lines, therefore only an effectively closed magnet array structure can form a relatively uniform and closed discharge lane. The main reasons for electrons' releasing from magnetic confinement are the vertical magnetic repelling force as well as a more and more weak confinement action in outer range etc. The dominant reasons for a comparatively low increase of substrate's temperature are that the density of bombarding electrons near the substrate is relatively low and their spatial distribution is relatively uniform (compared with that near the target surface). The erosion lane with an inverted Gauss's distribution shape on a magnetron sputtered target is due to that,with sputtering, the distribution width of the critical density of electrons shrinks continuously but the sputtering effect in the centerline of the corridor is always the most powerful.

  14. Particle dynamics during electronic sputtering of solid krypton

    DEFF Research Database (Denmark)

    Dutkiewicz, L.; Pedrys, R.; Schou, Jørgen

    1995-01-01

    We have modeled electronic sputtering of solid krypton by excimer production with molecular dynamics. Both excimer evolution in the solid and deexcitation processes have been incorporated in the simulation. The excimer dynamics in the lattice has been analyzed: the excimers formed near the surface...

  15. Sputtering of solid deuterium by He-ions

    DEFF Research Database (Denmark)

    Schou, Jørgen; Stenum, B.; Pedrys, R.

    2001-01-01

    Sputtering of solid deuterium by bombardment of 3He+ and 4He+ ions was studied. Some features are similar to hydrogen ion bombardment of solid deuterium, but for the He-ions a significant contribution of elastic processes to the total yield can be identified. The thin-film enhancement is more...

  16. Sputtering of Oxygen Ice by Low Energy Ions

    CERN Document Server

    Muntean, E A; Field, T A; Fitzsimmons, A; Hunniford, C A; McCullough, R W

    2015-01-01

    Naturally occurring ices lie on both interstellar dust grains and on celestial objects, such as those in the outer solar system. These ices are continu- ously subjected to irradiation by ions from the solar wind and/or cosmic rays, which modify their surfaces. As a result, new molecular species may form which can be sputtered off into space or planetary atmospheres. We determined the experimental values of sputtering yields for irradiation of oxygen ice at 10 K by singly (He+, C+, N+, O+ and Ar+) and doubly (C2+, N2+ and O2+) charged ions with 4 keV kinetic energy. In these laboratory experiments, oxygen ice was deposited and irradiated by ions in an ultra high vacuum chamber at low temperature to simulate the environment of space. The number of molecules removed by sputtering was observed by measurement of the ice thickness using laser interferometry. Preliminary mass spectra were taken of sputtered species and of molecules formed in the ice by temperature programmed desorption (TPD). We find that the experi...

  17. Modular design of AFM probe with sputtered silicon tip

    DEFF Research Database (Denmark)

    Rasmussen, Peter; Thaysen, Jacob; Bouwstra, Siebe;

    2001-01-01

    of the thin films constituting the cantilever. The AFM probe has an integrated tip made of a thick sputtered silicon layer, which is deposited after the probe has been defined and just before the cantilevers are released. The tips are so-called rocket tips made by reactive ion etching. We present probes...

  18. Plasma confinement at JET

    Science.gov (United States)

    Nunes, I.; JET Contributors

    2016-01-01

    Operation with a Be/W wall at JET (JET-ILW) has an impact on scenario development and energy confinement with respect to the carbon wall (JET-C). The main differences observed were (1) strong accumulation of W in the plasma core and (2) the need to mitigate the divertor target temperature to avoid W sputtering by Be and other low Z impurities and (3) a decrease of plasma energy confinement. A major difference is observed on the pedestal pressure, namely a reduction of the pedestal temperature which, due to profile stiffness the plasma core temperature is also reduced leading to a degradation of the global confinement. This effect is more pronounced in low β N scenarios. At high β N, the impact of the wall on the plasma energy confinement is mitigated by the weaker plasma energy degradation with power relative to the IPB98(y, 2) scaling calculated empirically for a CFC first wall. The smaller tolerable impurity concentration for tungsten (prevent W accumulation in the plasma core region as well as gas puffing to avoid W entering the plasma core by ELM flushing and reduction of the W source by decreasing the target temperature. W source and the target temperature can also be controlled by impurity seeding. Nitrogen and Neon have been used and with both gases the reduction of the W source and the target temperature is observed. Whilst more experiments with Neon are necessary to assess its impact on energy confinement, a partial increase of plasma energy confinement is observed with Nitrogen, through the increase of edge temperature. The challenge for scenario development at JET is to extend the pulse length curtailed by its transient behavior (W accumulation or MHD), but more importantly by the divertor target temperature limits. Re-optimisation of the scenarios to mitigate the effect of the change of wall materials maintaining high global energy confinement similar to JET-C is underway and JET has successfully achieved H 98(y,2)  =  1 for plasma currents up

  19. Effects of oxygen pressure in reactive ion beam sputter deposition of zirconium oxides

    International Nuclear Information System (INIS)

    The mechanism of reactive ion beam sputtering is investigated. The experimental results indicate that the pressure decrease during sputtering, the properties of Zr--O films, and the deposition rate are all strongly influenced by oxygen partial pressure. A new model which takes into account the gettering action of the deposition material and deals with the number of sputtered and gaseous particles is presented for reactive ion beam sputtering of metal. The theoretical values are compared with experimental results of the reactive ion beam sputtering. It is found that the calculated values agree extremely well with the oxygen partial pressure decrease and the deposition rate measured experimentally

  20. Angular distribution of sputtered atoms induced by low-energy heavy ion bombardment

    Institute of Scientific and Technical Information of China (English)

    ZHANG Lai; ZHANG Zhu-Lin

    2004-01-01

    The sputtering yield angular distributions have been calculated based on the ion energy dependence of total sputtering yields for Ni and Motargets bombarded by low-energy Hg+ ion. The calculated curves show excellent agreement with the corresponding Wehner's experimental results of sputtering yield angular distribution. The fact clearly demonstrated the intrinsic relation between the ion energy dependence of total sputtering yields and the sputtering yield angular distribution. This intrinsic relation had been ignored in Yamamura's papers (1981,1982) due to some obvious mistakes.

  1. Lifetime Calculations on Collector Optics from Laser Plasma Extreme Ultraviolet Sources with Minimum Mass

    Institute of Scientific and Technical Information of China (English)

    WU Tao; WANG Xin-Bing

    2011-01-01

    An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum. According to the ion flux and energy distribution, the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation. The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.%@@ An ion flux and its kinetic energy spectrum are obtained using a self similar spherically symmetric fluid model of expansion of a collisionless plasma into vacuum.According to the ion flux and energy distribution,the collector optical lifetime is estimated by knowledge of the sputtering yield of conventional Mo/Si multilayer coatings for the CO2 and Nd:YAG pulsed-laser produced plasmas based on the minimum mass tin droplet target without debris mitigation.The results show that the longer wavelength of the CO2 laser produced plasma light source is more suitable for extreme ultraviolet lithography than Nd:YAG laser in respect of fast ion debris induced sputtering damage to the collector mirror.

  2. Observation of a periodic runaway in the reactive Ar/O{sub 2} high power impulse magnetron sputtering discharge

    Energy Technology Data Exchange (ETDEWEB)

    Shayestehaminzadeh, Seyedmohammad, E-mail: ses30@hi.is, E-mail: shayesteh@mch.rwth-aachen.de; Arnalds, Unnar B.; Magnusson, Rögnvaldur L.; Olafsson, Sveinn [Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland)

    2015-11-15

    This paper reports the observation of a periodic runaway of plasma to a higher density for the reactive discharge of the target material (Ti) with moderate sputter yield. Variable emission of secondary electrons, for the alternating transition of the target from metal mode to oxide mode, is understood to be the main reason for the runaway occurring periodically. Increasing the pulsing frequency can bring the target back to a metal (or suboxide) mode, and eliminate the periodic transition of the target. Therefore, a pulsing frequency interval is defined for the reactive Ar/O{sub 2} discharge in order to sustain the plasma in a runaway-free mode without exceeding the maximum power that the magnetron can tolerate.

  3. Effect of magnetic field strength on deposition rate and energy flux in a dc magnetron sputtering system

    International Nuclear Information System (INIS)

    Variations in the magnetic field strongly affect the plasma parameters in a magnetron sputtering system. This in turn affects the throughput as well as the energy flux to the substrate. The variation in the magnetic field in this study, for a dc magnetron process, is achieved by shifting the magnet assembly slightly away from the target. Measurements of the plasma parameters show that while the electron density at the substrate increases with decrease in magnetic field, the electron temperature decreases. The cooling of the electron temperature is consistent with results reported elsewhere. The deposition rate per input magnetron power is found to increase slightly with the decrease in magnetic field for the process conditions considered in this study. Results suggest that the energy flux to the substrate tends to show a general decrease with the shift in the magnet assembly.

  4. Sky Brightness Measurements at Haleakala, 1955-2002

    Science.gov (United States)

    LaBonte, Barry

    2003-11-01

    Measurements of the brightness of the clear daytime sky at Haleakala, Maui are presented for the interval 1955 through 2002. The observations are made near the direction of the Sun, where forward scattering off aerosols dominates the sky brightness. The Haleakala summit at 3054 m is normally above the inversion layer. The Haleakala sky is dark; the observed brightness per airmass has a median of 10 millionths of the solar disk and a mode of 5 millionths, with Rayleigh scattering contributing 1 millionth. There is no demonstrable long-term trend in the data.

  5. Surface plasma source with saddle antenna radio frequency plasma generator.

    Science.gov (United States)

    Dudnikov, V; Johnson, R P; Murray, S; Pennisi, T; Piller, C; Santana, M; Stockli, M; Welton, R

    2012-02-01

    A prototype RF H(-) surface plasma source (SPS) with saddle (SA) RF antenna is developed which will provide better power efficiency for high pulsed and average current, higher brightness with longer lifetime and higher reliability. Several versions of new plasma generators with small AlN discharge chambers and different antennas and magnetic field configurations were tested in the plasma source test stand. A prototype SA SPS was installed in the Spallation Neutron Source (SNS) ion source test stand with a larger, normal-sized SNS AlN chamber that achieved unanalyzed peak currents of up to 67 mA with an apparent efficiency up to 1.6 mA∕kW. Control experiments with H(-) beam produced by SNS SPS with internal and external antennas were conducted. A new version of the RF triggering plasma gun has been designed. A saddle antenna SPS with water cooling is fabricated for high duty factor testing. PMID:22380221

  6. Au-nanoparticles grafted on plasma treated PE

    Energy Technology Data Exchange (ETDEWEB)

    Svorcik, V., E-mail: vaclav.svorcik@vscht.c [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Chaloupka, A. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Rezanka, P. [Department of Analytical Chemistry, Institute of Chemical Technology, Prague (Czech Republic); Slepicka, P. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic); Kolska, Z. [Department of Chemistry, J.E. Purkyne University, 400 96 Usti nad Labem (Czech Republic); Kasalkova, N.; Hubacek, T.; Siegel, J. [Department of Solid State Engineering, Institute of Chemical Technology, 166 28 Prague (Czech Republic)

    2010-03-15

    Polyethylene (PE) surface was treated with Ar plasma. Activated surface was grafted from methanol solution of 1,2-ethanedithiol. Then the sample was immersed into freshly prepared colloid solution of Au-nanoparticles. Finally Au layer was sputtered on the samples. Properties of the modified PE were studied using various methods: AFM, EPR, RBS and nanoindentation. It was shown that the plasma treatment results in degradation of polymer chain (AFM) and creation of free radicals by EPR. After grafting with dithiol, the concentration of free radicals declines. The presence of Au and S in the surface layer after the coating with Au-nanoparticles was proved by RBS. Plasma treatment changes PE surface morphology and increases surface roughness, too. Another significant change in surface morphology and roughness was observed after deposition of Au-nanoparticles. Nanoindentation measurements show that the grafting with Au-nanoparticles increases adhesion of subsequently sputtered Au layer.

  7. Au-nanoparticles grafted on plasma treated PE

    Science.gov (United States)

    Švorčík, V.; Chaloupka, A.; Řezanka, P.; Slepička, P.; Kolská, Z.; Kasálková, N.; Hubáček, T.; Siegel, J.

    2010-03-01

    Polyethylene (PE) surface was treated with Ar plasma. Activated surface was grafted from methanol solution of 1,2-ethanedithiol. Then the sample was immersed into freshly prepared colloid solution of Au-nanoparticles. Finally Au layer was sputtered on the samples. Properties of the modified PE were studied using various methods: AFM, EPR, RBS and nanoindentation. It was shown that the plasma treatment results in degradation of polymer chain (AFM) and creation of free radicals by EPR. After grafting with dithiol, the concentration of free radicals declines. The presence of Au and S in the surface layer after the coating with Au-nanoparticles was proved by RBS. Plasma treatment changes PE surface morphology and increases surface roughness, too. Another significant change in surface morphology and roughness was observed after deposition of Au-nanoparticles. Nanoindentation measurements show that the grafting with Au-nanoparticles increases adhesion of subsequently sputtered Au layer.

  8. Surface compositional changes in GaAs subjected to argon plasma treatment

    Energy Technology Data Exchange (ETDEWEB)

    Surdu-Bob, C.C.; Sullivan, J.L.; Saied, S.O.; Layberry, R.; Aflori, M

    2002-12-30

    X-ray photoelectron spectroscopy (XPS) has been employed to study surface compositional changes in GaAs (1 0 0) subjected to argon plasma treatment. The experimental results have been explained in terms of predicted argon ion energies, measured ion densities and etch rates. A model is proposed for the processes taking place at the surface of GaAs in terms of segregation, sputtering and surface relaxation. Stopping and range of ions in matter (SRIM) code has also been employedan aid to identification of the mechanisms responsible for the compositional changes. Argon plasma treatment induced surface oxidation at very low energies and sputtering and surface damage with increasing energy.

  9. Experiments on TFTR supershot plasmas

    Energy Technology Data Exchange (ETDEWEB)

    Strachan, J.D.; Bell, M.; Janos, A.; Kaye, S.; Kilpatrick, S.; Manos, D.; Mansfield, D.; Mueller, D.; Owens, K; Timberlake, J. [Princeton Univ., NJ (United States). Plasma Physics Lab.; Pitcher, C.S. [Canadian Fusion Fuels Technology Project, Toronto, ON (Canada); Snipes, J. [Massachusetts Inst. of Tech., Cambridge, MA (United States). Plasma Fusion Center

    1992-05-01

    Improvements to the TFTR limiter have extended the threshold for carbon blooms (an uncontrolled massive influx of carbon) to greater than 32 MW for 1 sec so that blooms seldom occur in present TFTR Supershot experiments. As a result of the progression from strong blooms to modest blooms to no blooms, improvements in confinement could be correlated with the occurrence of a carbon bloom in the plasma which immediately preceded the supershot. It is speculated that the carbon influx during a carbon bloom results in a limiter surface which has a slightly reduced self=sputtering yield for subsequent discharge. The influence on the supershot plasma seems similar to phenomena obtained by conditioning with lithium pellets.

  10. Visible Color and Photometry of Bright Materials on Vesta

    Science.gov (United States)

    Schroder, S. E.; Li, J. Y.; Mittlefehldt, D. W.; Pieters, C. M.; De Sanctis, M. C.; Hiesinger, H.; Blewett, D. T.; Russell, C. T.; Raymond, C. A.; Keller, H. U.

    2012-01-01

    The Dawn Framing Camera (FC) collected images of the surface of Vesta at a pixel scale of 70 m in the High Altitude Mapping Orbit (HAMO) phase through its clear and seven color filters spanning from 430 nm to 980 nm. The surface of Vesta displays a large diversity in its brightness and colors, evidently related to the diverse geology [1] and mineralogy [2]. Here we report a detailed investigation of the visible colors and photometric properties of the apparently bright materials on Vesta in order to study their origin. The global distribution and the spectroscopy of bright materials are discussed in companion papers [3, 4], and the synthesis results about the origin of Vestan bright materials are reported in [5].

  11. Bright Prospect for the Polyester Industrial Filament Sector

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    @@ Some large companies from Americaand Europe have constructed plantsin China or established long-termstable cooperation relationship withChinese enterprises. A bright devel-opment prospect has therefore beenbrought to the polyester industrial fila-ment sector in China.

  12. Are solar brightness variations faculae- or spot-dominated?

    CERN Document Server

    Shapiro, A I; Krivova, N A; Yeo, K L; Schmutz, W K

    2016-01-01

    Regular spaceborne measurements have revealed that solar brightness varies on multiple timescales, variations on timescales greater than a day being attributed to surface magnetic field. Independently, ground-based and spaceborne measurements suggest that Sun-like stars show a similar, but significantly broader pattern of photometric variability. To understand whether the broader pattern of stellar variations is consistent with the solar paradigm we assess relative contributions of faculae and spots to solar magnetically-driven brightness variability. We investigate how the solar brightness variability as well as its facular and spot contributions depend on the wavelength, timescale of variability, and position of the observer relative to the ecliptic plane. We perform calculations with the SATIRE model, which returns solar brightness with daily cadence from solar disc area coverages of various magnetic features. Moving the observer away from the ecliptic plane increases the amplitude of 11-year variability a...

  13. Hubble ultra deep field object surface brightness variation

    International Nuclear Information System (INIS)

    The technique of adjacent pixel brightness variation in log scale was applied to ultra deep field objects captured by the Hubble telescope. The local surface brightness fluctuation has a Gaussian-like distribution implying a random accretion of material, with collisions, as a random-walk motion. The larger fluctuation of log brightness in the mid to outer regions of some galaxies is consistent with the presence of dark matter. The absence of such fluctuation enhancement in two i-drop candidates at z ∼ 3 may mean that some dark matter is the result of nucleosynthesis in the evolution process. Large fluctuation in the B+V bands in contrast to the i+z band near the center in an i-drop candidate at z ∼ 3 was interpreted to be an AGN center. The distribution average shifts towards zero for more spiral galaxies, signifying the use of local surface brightness fluctuation distribution as a morphology parameter

  14. SMEX03 SSM/I Brightness Temperature Data, Brazil

    Data.gov (United States)

    National Aeronautics and Space Administration — This data set provides brightness temperature data acquired during the Soil Moisture Experiment 2003 (SMEX03) by the Special Sensor Microwave/Imager (SSM/I). The...

  15. SMEX03 SSM/I Brightness Temperature Data, Georgia

    Data.gov (United States)

    National Aeronautics and Space Administration — This data set provides brightness temperature data acquired during the Soil Moisture Experiment 2003 (SMEX03) by the Special Sensor Microwave/Imager (SSM/I). The...

  16. Ultra High Brightness/Low Cost Fiber Coupled Packaging Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The focus of the proposed effort is maximizing the brightness of fiber coupled laser diode pump sources at a minimum cost. The specific innovation proposed is to...

  17. Ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

    Science.gov (United States)

    Lautenschläger, T.; Feder, R.; Neumann, H.; Rice, C.; Schubert, M.; Bundesmann, C.

    2016-10-01

    In the present study, the influence of ion energy and geometrical parameters onto the angular and energy distribution of secondary particles for sputtering a Ti target with Ar ions is investigated. The angular distribution of the particle flux of the sputtered Ti atoms was determined by the collection method, i.e. by growing Ti films and measuring their thickness. The formal description of the particle flux can be realized by dividing it into an isotropic and an anisotropic part. The experimental data show that increasing the ion energy or decreasing the ion incidence angle lead to an increase of the isotropic part, which is in good agreement with basic sputtering theory. The energy distribution of the secondary ions was measured using an energy-selective mass spectrometer. The energy distribution of the sputtered target ions shows a maximum at an energy between 10 eV and 20 eV followed by a decay proportional to E-n, which is in principle in accordance with Thompson's theory, followed by a high energetic tail. When the sum of incidence angle and emission angle is increased, the high-energetic tail expands to higher energies and an additional peak due to direct sputtering events may occur. In the case of backscattered primary Ar ions, a maximum at an energy between 5 eV and 10 eV appears and, depending on the scattering geometry, an additional broad peak at a higher energy due to direct scattering events is observed. The center energy of the additional structure shifts systematically to higher energies with decreasing scattering angle or increasing ion energy. The experimental results are compared to calculations based on simple elastic two-particle-interaction theory and to simulations done with the Monte Carlo code SDTrimSP. Both confirm in principle the experimental findings.

  18. Analytically derived conversion of spectral band radiance to brightness temperature

    Energy Technology Data Exchange (ETDEWEB)

    Berk, Alexander [Spectral Sciences, Inc., 44th Avenue, Burlington, MA 01803 (United States)], E-mail: lex@spectral.com

    2008-05-15

    Simple analytic expressions for brightness temperature have been derived in terms of band response function spectral moments. Accuracy measures are also derived. Application of these formulas to GOES-12 Sounder thermal infrared bands produces brightness temperature residuals between -5.0 and 2.5 mK for a 150-400 K temperature range. The magnitude of residuals for the five ASTER Radiometer thermal infrared bands over the same temperature range is less than 0.22 mK.

  19. Night Sky Brightness and Light Pollution in Comunidad de Madrid

    OpenAIRE

    Zamorano Calvo, Jaime; Sánchez de Miguel, Alejandro; Gómez Castaño, José; Ocaña González, Francisco; Gallego Maestro, Jesús; Pila Díez, Berenice; Nievas Rosillo, Miguel; Tapia Ayuga, Carlos; Fernández Domínguez, Alberto; Pascual Ramírez, Sergio

    2013-01-01

    Preliminary results of a study of the night sky background brightness around the city of Madrid using Sky Quality Meter (SQM) photometers are presented. Data-retrieval methodology includes an automatic procedure to measure from a moving vehicle which allows to speed up the data gathering. The night sky brightness, an astronomical quality parameter that accounts for luminous flux from the sky, is closely related with the light pollution. The map with the spatial distribution of the night s...

  20. Supercontinuum generation with bright and dark solitons in optical fibers

    CERN Document Server

    Milián, Carles; Kudlinski, Alexandre; Skryabin, Dmitry V

    2016-01-01

    We study numerically and experimentally supercontinuum generation in optical fibers with dark and bright solitons simultaneously contributing into the spectral broadening and dispersive wave generation. We report a novel type of weak trapped radiation arising due to interaction of bright solitons with the dark soliton background. This radiation expresses itself as two pulses with the continuously shifting spectra constituting the short and long wavelength limits of the continuum. Our theoretical and experimental results are in good agreement.