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Sample records for boron doped eurofer97

  1. LCF and FCP in Eurofer97 steel

    International Nuclear Information System (INIS)

    Reduced activation ferritic martensitic steel, Eurofer97, is considered as one of the potential candidates for the structural components of the TBM (Test Blanket Module) of ITER and of future fusion power plants. Such components will operate under combined mechanical and thermal cycling, thus in order to design them the low cycle fatigue life and the fatigue crack propagation behaviour have to be examined. In the present work the low cycle fatigue life and fatigue crack propagation results for different technological products of Eurofer97 steel were investigated both in reference and in irradiated conditions. The fatigue behaviour of Eurofer97 steel is found to be similar to that of the conventional F82H steel. In both steels the decrease in fatigue resistance is observed with the increase of test temperature. A reduction in low cycle fatigue life occurs above 450 deg. C due to thermal activation of the material. A considerable scatter in fatigue life is observed in both steels, which is often attributed to the fact that fatigue is a stochastic process. No pronounced effect of the different technological product forms on the fatigue life of Eurofer97 has been observed. However, ODS Eurofer97 (0.5 wt.% Y2O3) steel exhibits a shorter fatigue life at higher strain range (1-1.4%). Irradiation at low temperature (300 deg. C, 2.5 dpa), when irradiation hardening occurs, is found to be beneficial at low strain amplitude and to be adverse at high strain amplitude. Irradiation at higher temperatures (> 450 deg. C, 2.5 dpa), when there is no irradiation hardening, seems not to affect low cycle fatigue behaviour of Eurofer97. The effect of creep/fatigue interaction is observed in the low strain ranges where the longer testing times allow the creep mechanism to affect the material. Hold time and irradiation at 450 deg. C up to 2.5 dpa have no influence on the fatigue crack propagation in Eurofer97 steel in the linear region II at testing temperature of 450 deg. C. (author)

  2. Overview and Critical Assessment of the Tensile Properties of unirradiated and irradiated EUROFER97

    Energy Technology Data Exchange (ETDEWEB)

    Lucon, E.; Vandermeulen, W.

    2007-10-15

    Material research represents a crucial issue for the assessment of fusion as a future viable source of energy. Structural materials, in particular, need to show a superior mechanical and chemical behaviour to guarantee the safe operation of the reactor during its whole lifetime, while retaining low activation characteristics to minimise the environmental impact of the produced waste. In this context, specific efforts have been focused for the last twenty years in Europe, Japan and the US, on developing suitable Reduced Activation Ferritic Martensitic (RAFM) steels as candidate structural materials. EUROFER97 has recently emerged in Europe as the reference material for the DEMO design. In the framework of the Long-Term Programme of EFDA (European Fusion Development Agreement), a coordinated effort has been launched aimed at providing a critical assessment of the mechanical and microstructural properties of EUROFER97 in the unirradiated and irradiated conditions, based on the results accumulated since the late 90ies within numerous EFDA tasks.

  3. Process optimization for diffusion bonding of tungsten with EUROFER97 using a vanadium interlayer

    International Nuclear Information System (INIS)

    Solid-state diffusion bonding is a selected joining technology to bond divertor components consisting of tungsten and EUROFER97 for application in fusion power plants. Due to the large mismatch in their coefficient of thermal expansions, which leads to serious thermally induced residual stresses after bonding, a thin vanadium plate is introduced as an interlayer. However, the diffusion of carbon originated from EUROFER97 in the vanadium interlayer during the bonding process can form a vanadium carbide layer, which has detrimental influences on the mechanical properties of the joint. For optimal bonding results, the thickness of this layer and the residual stresses has to be decreased sufficiently without a significant reduction of material transport especially at the vanadium/tungsten interface, which can be achieved by varying the diffusion bonding temperature and duration. The investigation results show that at a sufficiently low bonding temperature of 700 °C and a bonding duration of 4 h, the joint reaches a reasonable high ductility and toughness especially at elevated test temperature of 550 °C with elongation to fracture of 20% and mean absorbed Charpy impact energy of 2 J (using miniaturized Charpy impact specimens). The strength of the bonded materials is about 332 MPa at RT and 291 MPa at 550 °C. Furthermore, a low bonding temperature of 700 °C can also help to avoid the grain coarsening and the alteration of the grain structure especially of the EUROFER97 close to the bond interface

  4. Process optimization for diffusion bonding of tungsten with EUROFER97 using a vanadium interlayer

    Energy Technology Data Exchange (ETDEWEB)

    Basuki, Widodo Widjaja; Aktaa, Jarir

    2015-04-15

    Solid-state diffusion bonding is a selected joining technology to bond divertor components consisting of tungsten and EUROFER97 for application in fusion power plants. Due to the large mismatch in their coefficient of thermal expansions, which leads to serious thermally induced residual stresses after bonding, a thin vanadium plate is introduced as an interlayer. However, the diffusion of carbon originated from EUROFER97 in the vanadium interlayer during the bonding process can form a vanadium carbide layer, which has detrimental influences on the mechanical properties of the joint. For optimal bonding results, the thickness of this layer and the residual stresses has to be decreased sufficiently without a significant reduction of material transport especially at the vanadium/tungsten interface, which can be achieved by varying the diffusion bonding temperature and duration. The investigation results show that at a sufficiently low bonding temperature of 700 °C and a bonding duration of 4 h, the joint reaches a reasonable high ductility and toughness especially at elevated test temperature of 550 °C with elongation to fracture of 20% and mean absorbed Charpy impact energy of 2 J (using miniaturized Charpy impact specimens). The strength of the bonded materials is about 332 MPa at RT and 291 MPa at 550 °C. Furthermore, a low bonding temperature of 700 °C can also help to avoid the grain coarsening and the alteration of the grain structure especially of the EUROFER97 close to the bond interface.

  5. Fracture toughness master curve analysis of the tempered martensitic steel Eurofer97

    Energy Technology Data Exchange (ETDEWEB)

    Mueller, P.; Spatig, P.; Bonade, R. [EPFL-CBPP, Centre de Recherches en Physique des Plasmas, Association Euratom-Confederation Suisse, CH Villigen PSI (Switzerland); Odette, G. [UCSB, Santa-Barbara, Dept. of Mechanical Engineering UCSB, AK (United States)

    2007-07-01

    Full text of publication follows: The reduced activation tempered martensitic steel Eurofer97 is the European reference reduced activation steel for fusion applications. In this study, the fracture toughness properties of this steel are investigated in the ductile-to-brittle fracture transition region. The ASTM E-1921 master curve (equation 1 with {alpha} 0.019) describes well the temperature dependence of the median toughness of a variety of nuclear reactor pressure vessel steels. K{sub Jc(median)} = 30 + 70 exp[{alpha}(T - T{sub 0})] (1). We previously showed that fracture toughness data obtained with 0.35 T compact tension specimens are not satisfactorily described by the ASTM E1921 master curve in the lower transition region, corresponding to the temperature range [-150, -100 deg. C]. A better statistical description of the data was done, using a modified master curve shape with a coefficient {alpha} equal to 0.04 and a T{sub 0} value of -97 deg. C. In order to confirm the different shape of the fracture toughness curve of the Eurofer97, new fracture toughness tests were carried out at higher temperatures, up to -50 deg. C. These new data indicate that the K{sub Jc(median)}(T) curve in the transition is indeed steeper than the ASTM E1921 master curve. The validation of the modified master curve is discussed in terms of: i) the statistical predictions of scatter with temperature in comparison to the experimental data and ii) a self-consistent determination of T{sub 0} by performing series of single temperature T{sub 0}-analysis as well as multi-temperature T{sub 0}-analysis. A very good agreement between the predictions and experimental observations is found. Finally, the underlying possible physical reasons responsible for this specific fracture behavior of the Eurofer97 steel in the transition are briefly discussed in relation to its microstructure. (authors)

  6. Influence of the temperature on the tension behaviour of EUROFER97 alloy at high strain rate

    OpenAIRE

    Cadoni Ezio; Dotta Matteo; Forni Daniele; Spätig Philippe

    2015-01-01

    This paper presents an experimental investigation on the influence of the temperature on the reduced activation steel Eurofer97 under uniaxial tensile loads at high strain rate. Round undamaged specimens of this material having gauge length 5 mm, diameter 3 mm, were tested in universal machine to obtain its stress-strain relation under quasi-static condition (0.001s−1), and in modified Hopkinson bar to study its mechanical behaviour at high strain rates (300 s−1, 1000 s−1) respectively. The t...

  7. Comparative study of helium effects on EU-ODS EUROFER and EUROFER97 by nanoindentation and TEM

    Energy Technology Data Exchange (ETDEWEB)

    Roldán, M., E-mail: marcelo.roldan@ciemat.es [National Fusion Laboratory – CIEMAT, Avda. Complutense, 40, 28040 Madrid (Spain); Fernández, P. [National Fusion Laboratory – CIEMAT, Avda. Complutense, 40, 28040 Madrid (Spain); Rams, J. [Departamento de Matemática Aplicada, Ciencia e Ingeniería de Materiales y Tecnología Electrónica, ESCET, Universidad Rey Juan Carlos, C/Tulipán s/n, Móstoles, Madrid 28933 (Spain); Jiménez-Rey, D. [Centre for Micro-Analysis of Materials (CMAM, UAM), C/Faraday 3, 28049 Madrid (Spain); Materna-Morris, E.; Klimenkov, M. [Karlsruhe Institute of Technology (KIT), Institute for Advanced Materials (IAM-AWP), Hermann-von-Helmholtz-Platz, 1, 76344 Eggenstein-Leopoldshafen, Karlsruhe (Germany)

    2015-05-15

    Highlights: • EU-ODS EUROFER has been studied before and after He implantation by nanoindentation. • Specimens implanted in stair-like profile from 15 to 2 MeV (750 to 350 appm He). • Exhaustive comparison of nanoindentation results with EUROFER97 is presented. • TEM on EUROFER97 and EU-ODSEUROFER to correlate microstructure with hardness results. - Abstract: Helium effects on EU-ODS EUROFER were studied by means of nanoindentation and TEM. The results were compared with those of EUROFER97. Both steels were implanted in a stair-like profile configuration using energies from 2 MeV (maximum He content ∼750 appm He) to 15 MeV (minimum He ∼350 appm He) at room temperature. The nanoindentation tests on He implanted samples showed a hardness increase that depended on the He concentration. The maximum hardness increase observed at 5 mN was 21% in EU-ODS EUROFER and 41% in EUROFER97; it corresponded with the zone with the highest He concentration which was around 750 appm, according to MARLOWE simulation. In addition, FIB lamellae were prepared from EUROFER97 and EU-ODS EUROFER containing the aforementioned zones with maximum (750 appm) and minimum (300 appm) He. TEM investigations carried out showed small and homogeneously distributed He nanobubbles on both alloys in the zone corresponding with maximum He content. These microstructural features seem to be the cause of the hardness increase measured by nanoindentation.

  8. Mechanical and microstructural behaviour of Y2O3 ODS EUROFER 97

    International Nuclear Information System (INIS)

    Two small ingots of the steel EUROFER 97, one containing 0.25 wt% Y2O3 and the other Y2O3 free, have been produced by consolidating mechanically milled powder by hot isostatic pressing at 1373 K for 2 h under 200 MPa. For comparison, a third ingot was consolidated under identical conditions but using un-milled EUROFER powder. Microhardness, tensile and Charpy tests, along with TEM observations, have been performed on these materials in the as-HIPed condition and after different heat treatments. The mechanical behaviour and the microstructural characteristics of these materials suggest that the origin of the reduced impact properties of the oxide dispersion strengthened EUROFER could be the premature formation of carbides during quenching following the HIP process. This would be enhanced by the high density of structural defects produced by milling, as these favour the fast diffusion and segregation of carbon

  9. Influence of the temperature on the tension behaviour of EUROFER97 alloy at high strain rate

    Directory of Open Access Journals (Sweden)

    Cadoni Ezio

    2015-01-01

    Full Text Available This paper presents an experimental investigation on the influence of the temperature on the reduced activation steel Eurofer97 under uniaxial tensile loads at high strain rate. Round undamaged specimens of this material having gauge length 5 mm, diameter 3 mm, were tested in universal machine to obtain its stress-strain relation under quasi-static condition (0.001s−1, and in modified Hopkinson bar to study its mechanical behaviour at high strain rates (300 s−1, 1000 s−1 respectively. The tests at high strain rate were carried out at 450 °C and at nitrogen temperature. Finally, the parameters of the Zerilli-Armstrong constitutive material relationship were obtained.

  10. Fracture toughness master-curve analysis of the tempered martensitic steel Eurofer97

    Energy Technology Data Exchange (ETDEWEB)

    Mueller, Pablo [Fusion Technology-Materials, CRPP-EPFL, Association EURATOM-Confederation Suisse, ODGA-109, 5232 Villigen PSI (Switzerland)], E-mail: pablo.mueller@psi.ch; Spaetig, P.; Bonade, R. [Fusion Technology-Materials, CRPP-EPFL, Association EURATOM-Confederation Suisse, ODGA-109, 5232 Villigen PSI (Switzerland); Odette, G.R.; Gragg, D. [Materials and Mechanical Engineering Department, University of California, Santa Barbara, CA 93106-5070 (United States)

    2009-04-30

    We report fracture toughness data for the reduced activation tempered martensitic steel Eurofer97 in the lower to middle transition region. The fracture toughness was measured from tests carried out on 0.35T and 0.87T pre-cracked compact tension specimens. The data were first analyzed using the ASTM E1921 standard. The toughness-temperature behavior and scatter were shown to deviate from the ASTM E1921 standard predictions near the lower shelf. Using the method of maximum likelihood, the athermal component of the master-curve was calculated to better fit the data from the lower to the middle transition region. We showed that these master-curve adjustments are necessary to make the T{sub o} values obtained near the lower shelf with 0.35TC(T) specimens consistent with those obtained in the middle transition region with 0.87TC(T) specimens.

  11. Fracture toughness master-curve analysis of the tempered martensitic steel Eurofer97

    Science.gov (United States)

    Mueller, Pablo; Spätig, P.; Bonadé, R.; Odette, G. R.; Gragg, D.

    2009-04-01

    We report fracture toughness data for the reduced activation tempered martensitic steel Eurofer97 in the lower to middle transition region. The fracture toughness was measured from tests carried out on 0.35 T and 0.87 T pre-cracked compact tension specimens. The data were first analyzed using the ASTM E1921 standard. The toughness-temperature behavior and scatter were shown to deviate from the ASTM E1921 standard predictions near the lower shelf. Using the method of maximum likelihood, the athermal component of the master-curve was calculated to better fit the data from the lower to the middle transition region. We showed that these master-curve adjustments are necessary to make the To values obtained near the lower shelf with 0.35 TC( T) specimens consistent with those obtained in the middle transition region with 0.87 TC( T) specimens.

  12. Effect of helium implantation on mechanical properties of EUROFER97 evaluated by nanoindentation

    Energy Technology Data Exchange (ETDEWEB)

    Roldán, M., E-mail: marcelo.roldan@ciemat.es [National Fusion Laboratory-CIEMAT. Avda. Complutense 40, 28040 Madrid (Spain); Fernández, P. [National Fusion Laboratory-CIEMAT. Avda. Complutense 40, 28040 Madrid (Spain); Rams, J. [Rey Juan Carlos University, C/Tulipán s/n, Móstoles, 28933 Madrid (Spain); Jiménez-Rey, D. [Centre for Micro-Analysis of Materials (CMAM, UAM), C/Faraday 3, 28049 Madrid (Spain); Ortiz, C.J.; Vila, R. [National Fusion Laboratory-CIEMAT. Avda. Complutense 40, 28040 Madrid (Spain)

    2014-05-01

    Helium effects on EUROFER97 mechanical properties were studied by means of nanoindentation. The steel was implanted with He ions in a stair-like profile configuration using energies from 2 to 15 MeV at room temperature. Firstly, a deep nanoindentation study was carried out on as-received state (normalized + tempered) in order to obtain a reliable properties database at the nanometric scale, including aspects such as indentation size effect. The nanoindentation hardness of tests on He implanted samples showed a hardness increase depending on the He concentration. The hardness increase follows the He implantation concentration profile with a good accuracy according to BCA calculations using MARLOWE code, considering the whole volume affected by the nanoindentation tests. The results obtained in this work shown that nanoindentation technique permits to assess any change of hardness properties due to ion implantation.

  13. Fatigue cracks in Eurofer 97 steel: Part II. Comparison of small and long fatigue crack growth

    Science.gov (United States)

    Kruml, T.; Hutař, P.; Náhlík, L.; Seitl, S.; Polák, J.

    2011-05-01

    The fatigue crack growth rate in the Eurofer 97 steel at room temperature was measured by two different methodologies. Small crack growth data were obtained using cylindrical specimens with a shallow notch and no artificial crack starters. The growth of semicircular cracks of length between 10-2000 μm was followed in symmetrical cycling with constant strain amplitude ( R ɛ = -1). Long crack data were measured using standard CT specimen and ASTM methodology, i.e. R = 0.1. The growth of cracks having the length in the range of 10-30 mm was measured. It is shown that the crack growth rates of both types of cracks are in a very good agreement if J-integral representation is used and usual assumptions of the crack closure effects are taken into account.

  14. Fatigue cracks in Eurofer 97 steel: Part II. Comparison of small and long fatigue crack growth

    Energy Technology Data Exchange (ETDEWEB)

    Kruml, T., E-mail: kruml@ipm.cz [Institute of Physics of Materials, Academy of Sciences of the Czech Republic, Zizkova 22, CZ 61662 Brno (Czech Republic); Hutar, P.; Nahlik, L.; Seitl, S.; Polak, J. [Institute of Physics of Materials, Academy of Sciences of the Czech Republic, Zizkova 22, CZ 61662 Brno (Czech Republic)

    2011-05-01

    The fatigue crack growth rate in the Eurofer 97 steel at room temperature was measured by two different methodologies. Small crack growth data were obtained using cylindrical specimens with a shallow notch and no artificial crack starters. The growth of semicircular cracks of length between 10-2000 {mu}m was followed in symmetrical cycling with constant strain amplitude (R{sub {epsilon}} = -1). Long crack data were measured using standard CT specimen and ASTM methodology, i.e. R = 0.1. The growth of cracks having the length in the range of 10-30 mm was measured. It is shown that the crack growth rates of both types of cracks are in a very good agreement if J-integral representation is used and usual assumptions of the crack closure effects are taken into account.

  15. Coincidence Doppler broadening study of Eurofer 97 irradiated in spallation environment

    Energy Technology Data Exchange (ETDEWEB)

    Sabelová, V., E-mail: veronika.sabelova@stuba.sk [Institute of Nuclear and Physical Engineering, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology in Bratislava, Ilkovičova 3, 81219 Bratislava (Slovakia); Laboratory for Nuclear Materials, Paul Scherrer Institut, 5232 Villigen PSI (Switzerland); Kršjak, V. [Laboratory for Nuclear Materials, Paul Scherrer Institut, 5232 Villigen PSI (Switzerland); Kuriplach, J. [Department of Low Temperature Physics, Faculty of Mathematics and Physics, Charles University in Prague, V Holešovičkách 2, 18000 Prague 8 (Czech Republic); Dai, Y. [Laboratory for Nuclear Materials, Paul Scherrer Institut, 5232 Villigen PSI (Switzerland); Slugeň, V. [Institute of Nuclear and Physical Engineering, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology in Bratislava, Ilkovičova 3, 81219 Bratislava (Slovakia)

    2015-03-15

    The behavior of transmutation helium during isochronal annealing of irradiated Eurofer 97 was investigated using coincidence Doppler broadening spectroscopy (CDBS). The investigated ferritic martensitic steel was irradiated in 2000 and 2001 in the frame of the STIP-II project at the Swiss neutron spallation source (SINQ) (irradiation with neutrons and protons) at the Paul Scherrer Institute (PSI). During isochronal annealing experiment, coarsening of vacancy clusters and/or growth of helium bubbles was observed at T ⩾ 500 °C. This process causes an increase of low-momentum annihilation events and related increase of the S parameter during thermal treatment of material. On the other hand, the maximum concentration of helium in small vacancy clusters (V{sub n}) was observed after annealing at 400 °C, where an excellent correlation with the calculated CDBS profiles of V{sub n} + He{sub m} clusters was found.

  16. Coincidence Doppler broadening study of Eurofer 97 irradiated in spallation environment

    Science.gov (United States)

    Sabelová, V.; Kršjak, V.; Kuriplach, J.; Dai, Y.; Slugeň, V.

    2015-03-01

    The behavior of transmutation helium during isochronal annealing of irradiated Eurofer 97 was investigated using coincidence Doppler broadening spectroscopy (CDBS). The investigated ferritic martensitic steel was irradiated in 2000 and 2001 in the frame of the STIP-II project at the Swiss neutron spallation source (SINQ) (irradiation with neutrons and protons) at the Paul Scherrer Institute (PSI). During isochronal annealing experiment, coarsening of vacancy clusters and/or growth of helium bubbles was observed at T ⩾ 500 °C. This process causes an increase of low-momentum annihilation events and related increase of the S parameter during thermal treatment of material. On the other hand, the maximum concentration of helium in small vacancy clusters (Vn) was observed after annealing at 400 °C, where an excellent correlation with the calculated CDBS profiles of Vn + Hem clusters was found.

  17. Metallurgical properties of reduced activation martensitic steel Eurofer'97 in the as-received condition and after thermal ageing

    International Nuclear Information System (INIS)

    This paper describes the microstructural studies and the mechanical testing (hardness, tensile and charpy tests) performed on the Eurofer'97 steel in the as-received condition and after thermal ageing treatments up to 600 deg. C. In addition, fracture toughness tests on the as-received condition have been carried out in order to determine the Master Curve. During the thermal ageing treatments studied (500 deg. C/5000 h and 600 deg. C/1000 h) the general microstructure of the steel (tempered martensite with M23C6 and MX precipitates) remained stable. Only a slight growth of the particles has been observed. In terms of mechanical properties, the Eurofer'97 steel exhibited similar values of tensile properties (tensile and yield strength) and ductile-brittle transition temperature regardless of the material condition studied.

  18. Quantitative TEM analysis of precipitation and grain boundary segregation in neutron irradiated EUROFER 97

    Energy Technology Data Exchange (ETDEWEB)

    Dethloff, Christian, E-mail: christian.dethloff@kit.edu; Gaganidze, Ermile; Aktaa, Jarir

    2014-11-15

    Characterization of irradiation induced microstructural defects is essential for assessing the applicability of structural steels like the Reduced Activation Ferritic/Martensitic steel EUROFER 97 in upcoming fusion reactors. In this work Transmission Electron Microscopy (TEM) is used to analyze the types and structure of precipitates, and the evolution of their size distributions and densities caused by neutron irradiation to a dose of 32 displacements per atom (dpa) at 330–340 °C in the irradiation experiment ARBOR 1. A significant growth of MX and M{sub 23}C{sub 6} type precipitates is observed after neutron irradiation, while the precipitate density remains unchanged. Hardening caused by MX and M{sub 23}C{sub 6} precipitate growth is assessed by applying the Dispersed Barrier Hardening (DBH) model, and shown to be of minor importance when compared to other irradiation effects like dislocation loop formation. Additionally, grain boundary segregation of chromium induced by neutron irradiation was investigated and detected in irradiated specimens.

  19. Thermomechanical analysis of diffusion-bonded tungsten/EUROFER97 with a vanadium interlayer

    Energy Technology Data Exchange (ETDEWEB)

    Basuki, Widodo Widjaja; Dahm, Ralf; Aktaa, Jarir

    2014-12-15

    Earlier basic investigations revealed that diffusion bonding between tungsten and RAFM-steel at a relatively low temperature using a thin low-activation vanadium interlayer having a CTE between that of the parent materials can significantly reduce the residual stresses and produce defect-free bond interfaces. The joint has a high strength as well as sufficient ductility and toughness especially at the test temperature of about 550 °C. To apply this knowledge in fusion power plants, particularly in divertors, an acceptable lifetime of such structural joints is required, since they are exposed to high thermomechanical cyclic loading. To simulate the possible operational conditions of a He-cooled divertor, diffusion-bonded specimens are loaded by thermal cycling in a temperature range between 350 °C and 500 °C and a constant tensile stress based on the calculation of the internal pressure of the divertor thimble. The aim of this experimental work is to check the resistance of the diffusion-bonded W/EUROFER97 against ratcheting during thermomechanical loading and analyze the evolution of microstructures of the joint especially along the bond interfaces.

  20. Effect of mechanical alloying and compaction parameters on the mechanical properties and microstructure of EUROFER 97 ODS steel

    International Nuclear Information System (INIS)

    Oxide dispersion strengthened (ODS) ferritic / martensitic (F/M) steels appear to be promising candidates for the future fusion reactor. Their inherent properties, good thermal conductivity, swelling resistance and low radiation damage accumulation, deriving from the base material EUROFER 97, are further enhanced by the presence of the fine dispersion of oxide particles. They would allow in principle for a higher operating temperature of the fusion reactor, which improves its thermal efficiency. In effect, their strength remains higher than the base material with increasing temperature. Their creep properties are also improved relatively to the base material. It is the pinning of dislocations at dispersed oxide particles that helps to improve the high temperature mechanical properties. EUROFER97 is a reduced activation F/M steel, whose chemical composition is 8.9 wt. % Cr, 1.1 wt. % W, 0.47 wt. % Mn, 0.2 wt. % V, 0.14 wt. % Ta and 0.11 wt. % C and Fe for the balance. A new ODS F/M steel based on EUROFER 97 is developed with the strengthening material as Y2O3 maintained at 0.3wt% based on our past experience. The ODS powder is produced by a different powder metallurgy route. The Eurofer 97 atomized powder with particle sizes around 45 μm is ball milled in argon atmosphere in a planetary ball mill together with Yttria particles with sizes about 10 to 30 nm. The milled powders are now canned in a steel container. They are degassed at 450 oC for 3 hours under a vacuum of 10-5 mbar. The canned sample is sealed in vacuum and finally compacted by hot isostatic pressing (HIP) in argon atmosphere under a pressure of 180 MPa at 1000 oC for 1 hour. Electron microscopy and X-ray diffraction observations are done at regular intervals during ball milling to identify changes in the particle and crystallite size and in particular with the solubility of Yttria in the matrix. Further, The microstructure and mechanical properties of final compacted material is assessed. The size

  1. Comparison of microstructural properties and Charpy impact behaviour between different plates of the Eurofer97 steel and effect of isothermal ageing

    Energy Technology Data Exchange (ETDEWEB)

    Stratil, Ludek [Institute of Physics of Materials, Academy of Sciences of the Czech Republic, Zizkova 22, 616 62 Brno (Czech Republic); Hadraba, Hynek, E-mail: hadraba@ipm.cz [Institute of Physics of Materials, Academy of Sciences of the Czech Republic, Zizkova 22, 616 62 Brno (Czech Republic); Bursik, Jiri; Dlouhy, Ivo [Institute of Physics of Materials, Academy of Sciences of the Czech Republic, Zizkova 22, 616 62 Brno (Czech Republic)

    2011-09-30

    Highlights: > Two plates of Eurofer97 steel were tested in thermally unaffected and aged state. > The two plates of Eurofer97 differ significantly in mean prior austenite grain size. > The different grain size lead to different transition temperature between the plates. > Thermal ageing applied lead to slight microstructural changes of the Eurofer97. > The microstructural changes caused small shift of transition temperature. - Abstract: The microstructure and fracture properties of the Eurofer97 steel plates of thickness 14 mm and 25 mm were investigated in as-received state and in state after long-term thermal ageing (550 deg. C/5000 h). Detailed microstructure studies were carried out by means of optical light, electron and quantitative electron microscopy. Mechanical properties were evaluated by means of Charpy impact testing and hardness testing and fracture surfaces were fractographically analysed in macro and microscales. The microstructure of the Eurofer97 consisted of tempered martensite with M{sub 23}C{sub 6} and MX precipitates. Microstructure of 14 mm plate was more homogenous and fine grained than 25 mm plate. Due to different microstructure the t{sub DBTT} of thicker plate was on +10 deg. C higher than for 14 mm plate for which reached -60 deg. C. Slight microstructural changes on the level of subgrain consisting of their partial recrystallization and slight carbide coarsening were observed after applied ageing. The isothermal ageing caused evident shift in t{sub DBTT} about +5 deg. C, which was most likely caused by recrystallization of subgrains.

  2. Final Report on Investigations of the influence of Helium concentration and implantation rate on Cavity Nucleation and Growth during neutron irradiation of Fe and EUROFER 97

    DEFF Research Database (Denmark)

    Eldrup, Morten Mostgaard; Singh, Bachu Narain; Golubov, S.

    ) and Transmission Electron Microscopy (TEM). The PAS investigations revealed a clear difference between the He implantation effects in Fe and EUROFER 97 at 623 K. For both materials the mean positron lifetimes increased with He dose in the range 1 – 100 appm, although the increase was stronger for Fe than...... to neutron irradiation results in a cavity density increase to ~1×1022 m-3. In EUROFER 97 a very inhomogeneous cavity distribution, formed at dislocations and interfaces, is observed after He implantation with subsequent neutron irradiation. In addition, a very low density of very large voids have been...

  3. Boron doping a semiconductor particle

    Science.gov (United States)

    Stevens, Gary Don; Reynolds, Jeffrey Scott; Brown, Louanne Kay

    1998-06-09

    A method (10,30) of boron doping a semiconductor particle using boric acid to obtain a p-type doped particle. Either silicon spheres or silicon powder is mixed with a diluted solution of boric acid having a predetermined concentration. The spheres are dried (16), with the boron film then being driven (18) into the sphere. A melt procedure mixes the driven boron uniformly throughout the sphere. In the case of silicon powder, the powder is metered out (38) into piles and melted/fused (40) with an optical furnace. Both processes obtain a p-type doped silicon sphere with desired resistivity. Boric acid is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirements.

  4. Fatique crack growth in EUROFER 97 at different temperatures. Final report, tasks: TW1-TTMS-002, D22 and TW2-TTMS-002a, D22

    Energy Technology Data Exchange (ETDEWEB)

    Aktaa, J.; Lerch, M.

    2005-05-01

    For the assessment of cracks in First Wall structures built from EUROFER 97 of future fusion reactors the fatigue crack behaviour in EUROFER 97 was investigated at room temperature (RT), 300, 500 and 550 C. For this purpose fatigue crack growth tests were performed using CT specimens with two R-ratios, R=0.1 and R=0.5, respectively. Hence, fatigue crack threshold, fatigue crack growth behaviour in the near-threshold range and their dependences on temperature and R-ratio were determined and described using an analytical formula. The fatigue crack threshold showed a monotonic dependence on temperature which is for insignificantly small. The fatigue crack growth behaviour exhibited for a nonmonotonic dependence on temperature which is explained by the decrease of yield stress and the increase of creep damage when increasing the temperature. [German] Zur Beurteilung von Rissen in aus EUROFER 97 gefertigten Strukturen der Ersten Wand zukuenftiger Fusionsreaktoren wurde das Ermuedungsrissverhalten in EUROFER 97 bei Raumtemperatur (RT), 300, 500 und 550 C untersucht. Hierfuer wurden bei jeder Temperatur Ermuedungsrissexperimente an CT-Proben mit zwei unterschiedlichen R-Verhaeltnissen, und durchgefuehrt. Daraus wurden der Ermuedungsrisswiderstand und das Ermuedungsrissverhalten im risswiderstandsnahen Bereich sowie ihre Abhaengigkeiten von der Temperatur und dem R-Verhaeltnis ermittelt und mit analytischen Formeln beschrieben. Der Ermuedungsrisswiderstand zeigte eine monotone Abhaengigkeit von der Temperatur, die bei geringfuegig ist. Das Ermuedungsrissverhalten hingegen wies bei eine nicht-monotone Abhaengigkeit von der Temperatur auf, die auf die Abnahme der Fliessspannung und die Zunahme der Kriechschaedigung mit steigender Temperatur zurueckgefuehrt wird.

  5. Final Report on investigations of the influence of helium concentration and implantation rate on cavity nucleation and growth during neutron irradiation of Fe and EUROFER 97

    Energy Technology Data Exchange (ETDEWEB)

    Eldrup, M.; Singh, B.N. (Risoe DTU, Materials Research Div., Roskilde (Denmark)); Golubov, S. (Materials Science and Technology Div., Oak Ridge National Lab., Oak Ridge (United States))

    2010-09-15

    This report presents results of investigations of damage accumulation during neutron irradiation of pure iron and EUROFER 97 steel with or without prior helium implantation. The defect microstructure, in particular the cavities, was characterized using Positron Annihilation Spectroscopy (PAS) and Transmission Electron Microscopy (TEM). The PAS investigations revealed a clear difference between the He implantation effects in Fe and EUROFER 97 at 623 K. For both materials the mean positron lifetimes increased with He dose in the range 1-100 appm, although the increase was stronger for Fe than for EUROFER 97 and for both materials smaller for implantation at 623 K than at 323 K. This lifetime increase is due primarily to the formation of He bubbles. For He doses of 10-100 appm cavity sizes and densities in Fe were estimated to be 1.7-2.8 nm and 4-14 x 10{sup 21} m{sup -3}, respectively. Neutron irradiation after He implantation in general leads to an increase of both cavity sizes and densities. Estimates of cavity sizes and densities in EUROFER 97 after neutron irradiation with or without prior helium implantation are rather uncertain, but lead to values of the same order as for iron. TEM cannot resolve any cavities in Fe or EUROFER 97 after implantation of 100 appm He neither at 323 K nor at 623 K. However, neutron irradiation at 623 K to a dose level of 0.23 dpa in Fe is observed to lead to cavities with sizes of about 4 nm and densities of about 1.5 x 10{sup 21} m{sup -3}. He implantation (100 appm) prior to neutron irradiation results in a cavity density increase to {approx} 1 x 10{sup 22} m{sup -3}. In EUROFER 97 a very inhomogeneous cavity distribution, formed at dislocations and interfaces, is observed after He implantation with subsequent neutron irradiation. In addition, a very low density of very large voids have been observed in Fe (without He) neutron irradiated at 323 K, already at a dose level of 0.036 dpa. Detailed numerical calculations within the

  6. Reduced Activation Ferritic/Martensitic Steel Eurofer 97 as Possible Structural Material for Fusion Devices. Metallurgical Characterization on As-Received Condition and after Simulated Services Conditions

    International Nuclear Information System (INIS)

    Metallurgical Characterization of the reduced activation ferritic/martensitic steel Eurofer'97, on as-received condition and after thermal ageing treatment in the temperature range from 400 degree centigree to 600 degree centigree for periods up to 10.000 h, was carried out. The microstructure of the steel remained stable (tempered martensite with M23 C6 and MX precipitates) after the thermal ageing treatments studied in this work. In general, this stability was also observed in the mechanical properties. The Eurofer'97 steel exhibited similar values of hardness, ultimate tensile stress, 0,2% proof stress, USE and T03 regardless of the investigated material condition. However, ageing at 600 degree centigree for 10.000 ha caused a slight increase in the DBTT, of approximately 23 . In terms of creep properties, the steel shows in general adequate creep rupture strength levels for short rupture times. However, the results obtained up to now for long time creep rupture tests at 500 degree centigree suggests a change in the deformation mechanisms. (Author) 62 refs

  7. Stabilization of boron carbide via silicon doping.

    Science.gov (United States)

    Proctor, J E; Bhakhri, V; Hao, R; Prior, T J; Scheler, T; Gregoryanz, E; Chhowalla, M; Giulani, F

    2015-01-14

    Boron carbide is one of the lightest and hardest ceramics, but its applications are limited by its poor stability against a partial phase separation into separate boron and carbon. Phase separation is observed under high non-hydrostatic stress (both static and dynamic), resulting in amorphization. The phase separation is thought to occur in just one of the many naturally occurring polytypes in the material, and this raises the possibility of doping the boron carbide to eliminate this polytype. In this work, we have synthesized boron carbide doped with silicon. We have conducted a series of characterizations (transmission electron microscopy, scanning electron microscopy, Raman spectroscopy and x-ray diffraction) on pure and silicon-doped boron carbide following static compression to 50 GPa non-hydrostatic pressure. We find that the level of amorphization under static non-hydrostatic pressure is drastically reduced by the silicon doping.

  8. XPS analysis of boron doped heterofullerenes

    Energy Technology Data Exchange (ETDEWEB)

    Schnyder, B.; Koetz, R. [Paul Scherrer Inst. (PSI), Villigen (Switzerland); Muhr, H.J.; Nesper, R. [ETH Zurich, Zurich (Switzerland)

    1997-06-01

    Boron heterofullerenes were generated through arc-evaporation of doped graphite rods in a helium atmosphere. According to mass spectrometric analysis only mono-substituted fullerenes like C{sub 59}B, C{sub 69}B and higher homologues together with a large fraction of higher undoped fullerenes were extracted and enriched when pyridine was used as the solvent. XPS analysis of the extracts indicated the presence of two boron species with significantly different binding energies. One peak was assigned to borid acid. The second one corresponds to boron in the fullerene cage, which is mainly C{sub 59}B, according to the mass spectrum. This boron is in a somewhat higher oxidation state than that of ordinary boron-carbon compounds. The reported synthesis and extraction procedure opens a viable route for production of macroscopic amounts of these compounds. (author) 2 figs., 1 tab., 7 refs.

  9. Innovative boron nitride-doped propellants

    Directory of Open Access Journals (Sweden)

    Thelma Manning

    2016-04-01

    Full Text Available The U.S. military has a need for more powerful propellants with balanced/stoichiometric amounts of fuel and oxidants. However, balanced and more powerful propellants lead to accelerated gun barrel erosion and markedly shortened useful barrel life. Boron nitride (BN is an interesting potential additive for propellants that could reduce gun wear effects in advanced propellants (US patent pending 2015-026P. Hexagonal boron nitride is a good lubricant that can provide wear resistance and lower flame temperatures for gun barrels. Further, boron can dope steel, which drastically improves its strength and wear resistance, and can block the formation of softer carbides. A scalable synthesis method for producing boron nitride nano-particles that can be readily dispersed into propellants has been developed. Even dispersion of the nano-particles in a double-base propellant has been demonstrated using a solvent-based processing approach. Stability of a composite propellant with the BN additive was verified. In this paper, results from propellant testing of boron nitride nano-composite propellants are presented, including closed bomb and wear and erosion testing. Detailed characterization of the erosion tester substrates before and after firing was obtained by electron microscopy, inductively coupled plasma and x-ray photoelectron spectroscopy. This promising boron nitride additive shows the ability to improve gun wear and erosion resistance without any destabilizing effects to the propellant. Potential applications could include less erosive propellants in propellant ammunition for large, medium and small diameter fire arms.

  10. Innovative boron nitride-doped propellants

    Institute of Scientific and Technical Information of China (English)

    Thelma MANNING; Henry GRAU; Paul MATTER; Michael BEACHY; Christopher HOLT; Samuel SOPOK; Richard FIELD; Kenneth KLINGAMAN; Michael FAIR; John BOLOGNINI; Robin CROWNOVER; Carlton P. ADAM; Viral PANCHAL; Eugene ROZUMOV

    2016-01-01

    The U.S. military has a need for more powerful propellants with balanced/stoichiometric amounts of fuel and oxidants. However, balanced and more powerful propellants lead to accelerated gun barrel erosion and markedly shortened useful barrel life. Boron nitride (BN) is an interesting potential additive for propellants that could reduce gun wear effects in advanced propellants (US patent pending 2015-026P). Hexagonal boron nitride is a good lubricant that can provide wear resistance and lower flame temperatures for gun barrels. Further, boron can dope steel, which drastically improves its strength and wear resistance, and can block the formation of softer carbides. A scalable synthesis method for producing boron nitride nano-particles that can be readily dispersed into propellants has been developed. Even dispersion of the nano-particles in a double-base propellant has been demonstrated using a solvent-based processing approach. Stability of a composite propellant with the BN additive was verified. In this paper, results from propellant testing of boron nitride nano-composite propellants are presented, including closed bomb and wear and erosion testing. Detailed characterization of the erosion tester substrates before and after firing was obtained by electron microscopy, inductively coupled plasma and x-ray photoelectron spectroscopy. This promising boron nitride additive shows the ability to improve gun wear and erosion resistance without any destabilizing effects to the propellant. Potential applications could include less erosive propellants in propellant ammunition for large, medium and small diameter fire arms.

  11. Doping Silicon Wafers with Boron by Use of Silicon Paste

    Institute of Scientific and Technical Information of China (English)

    Yu Gao; Shu Zhou; Yunfan Zhang; Chen Dong; Xiaodong Pi; Deren Yang

    2013-01-01

    In this work we introduce recently developed silicon-paste-enabled p-type doping for silicon.Boron-doped silicon nanoparticles are synthesized by a plasma approach.They are then dispersed in solvents to form silicon paste.Silicon paste is screen-printed at the surface of silicon wafers.By annealing,boron atoms in silicon paste diffuse into silicon wafers.Chemical analysis is employed to obtain the concentrations of boron in silicon nanoparticles.The successful doping of silicon wafers with boron is evidenced by secondary ion mass spectroscopy (SIMS) and sheet resistance measurements.

  12. Characterization of boron doped nanocrystalline diamonds

    Energy Technology Data Exchange (ETDEWEB)

    Peterlevitz, A C; Manne, G M; Sampaio, M A; Quispe, J C R; Pasquetto, M P; Iannini, R F; Ceragioli, H J; Baranauskas, V [Faculdade de Engenharia Eletrica e Computacao, Departamento de Semicondutores, Instrumentos e Fotonica, Universidade Estadual de Campinas, UNICAMP, Av. Albert Einstein N.400, 13083-852 Campinas SP Brasil (Brazil)], E-mail: vitor.baranauskas@gmail.com

    2008-03-15

    Nanostructured diamond doped with boron was prepared using a hot-filament assisted chemical vapour deposition system fed with an ethyl alcohol, hydrogen and argon mixture. The reduction of the diamond grains to the nanoscale was produced by secondary nucleation and defects induced by argon and boron atoms via surface reactions during chemical vapour deposition. Raman measurements show that the samples are nanodiamonds embedded in a matrix of graphite and disordered carbon grains, while morphological investigations using field electron scanning microscopy show that the size of the grains ranges from 20 to 100 nm. The lowest threshold fields achieved were in the 1.6 to 2.4 V/{mu}m range.

  13. Piezoresistive boron doped diamond nanowire

    Energy Technology Data Exchange (ETDEWEB)

    Sumant, Anirudha V.; Wang, Xinpeng

    2016-09-13

    A UNCD nanowire comprises a first end electrically coupled to a first contact pad which is disposed on a substrate. A second end is electrically coupled to a second contact pad also disposed on the substrate. The UNCD nanowire is doped with a dopant and disposed over the substrate. The UNCD nanowire is movable between a first configuration in which no force is exerted on the UNCD nanowire and a second configuration in which the UNCD nanowire bends about the first end and the second end in response to a force. The UNCD nanowire has a first resistance in the first configuration and a second resistance in the second configuration which is different from the first resistance. The UNCD nanowire is structured to have a gauge factor of at least about 70, for example, in the range of about 70 to about 1,800.

  14. Synthesis and characterization of boron-doped carbon nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Ceragioli, H J; Peterlevitz, A C; Quispe, J C R; Pasquetto, M P; Sampaio, M A; Baranauskas, V [Faculdade de Engenharia Eletrica e Computacao, Departamento de Semicondutores, Instrumentos e Fotonica, Universidade Estadual de Campinas, UNICAMP, Av. Albert Einstein N.400, 13083-852 Campinas SP Brasil (Brazil); Larena, A [Department of Chemical Industrial Engineering and Environment, Universidad Politecnica de Madrid, E.T.S. Ingenieros Industriales, C/ Jose Gutierrez Abascal, Madrid (Spain)], E-mail: vitor.baranauskas@gmail.com

    2008-03-15

    Boron-doped carbon nanotubes have been prepared by chemical vapour deposition of ethyl alcohol doped with B{sub 2}O{sub 3} using a hot-filament system. Multi-wall carbon nanotubes of diameters in the range of 30-100 nm have been observed by field emission scanning electron microscopy (FESEM). Raman measurements indicated that the degree of C-C sp{sup 2} order decreased with boron doping. Lowest threshold fields achieved were 1.0 V/{mu}m and 2.1 V/{mu}m for undoped and boron-doped samples, respectively.

  15. Physical properties of CVD boron-doped multiwalled carbon nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Mondal, Kartick C. [Molecular Sciences Institute and School of Chemistry, University of the Witwatersrand, P.O. Wits, 2050 Johannesburg (South Africa); DST/NRF Centre of Excellence in Strong Materials, P.O. Wits, 2050 Johannesburg (South Africa); Strydom, Andre M. [Department of Physics, University of Johannesburg, PO Box 524, Auckland Park 2006 (South Africa)], E-mail: amstrydom@uj.ac.za; Erasmus, Rudolph M.; Keartland, Jonathan M. [DST/NRF Centre of Excellence in Strong Materials, P.O. Wits, 2050 Johannesburg (South Africa); School of Physics, University of the Witwatersrand, P.O. Wits, 2050 Johannesburg (South Africa); Coville, Neil J. [Molecular Sciences Institute and School of Chemistry, University of the Witwatersrand, P.O. Wits, 2050 Johannesburg (South Africa); DST/NRF Centre of Excellence in Strong Materials, P.O. Wits, 2050 Johannesburg (South Africa)], E-mail: Neil.Coville@wits.ac.za

    2008-10-15

    The effects of boron doping and electron correlation on the transport properties of CVD boron-doped multiwalled carbon nanotubes are reported. The boron-doped multiwalled carbon nanotubes were characterized by TEM as well as Raman spectroscopy using different laser excitations (viz. 488, 514.5 and 647 nm). The intensity of the D-band laser excitation line increased after the boron incorporation into the carbon nanotubes. The G-band width increased on increasing the boron concentration, indicating the decrease of graphitization with increasing boron concentration. Electrical conductivity of the undoped and boron-doped carbon nanotubes reveal a 3-dimensional variable-range-hopping conductivity over a wide range of temperature, viz. from room temperature down to 2 K. The electrical conductivity is not found to be changed significantly by the present levels of B-doping. Electron Paramagnetic Resonance (EPR) results for the highest B-doped samples showed similarities with previously reported EPR literature measurements, but the low concentration sample gives a very broad ESR resonance line.

  16. Boron doping of graphene-pushing the limit.

    Science.gov (United States)

    Chaban, Vitaly V; Prezhdo, Oleg V

    2016-08-25

    Boron-doped derivatives of graphene have been intensely investigated because of their electronic and catalytic properties. The maximum experimentally observed concentration of boron atoms in graphite was 2.35% at 2350 K. By employing quantum chemistry coupled with molecular dynamics, we identified the theoretical doping limit for single-layer graphene at different temperatures, demonstrating that it is possible to achieve much higher boron doping concentrations. According to the calculations, 33.3 mol% of boron does not significantly undermine thermal stability, whereas 50 mol% of boron results in critical backbone deformations, which occur when three or more boron atoms enter the same six-member ring. Even though boron is less electro-negative than carbon, it tends to act as an electron acceptor in the vicinity of C-B bonds. The dipole moment of B-doped graphene depends strongly on the distribution of dopant atoms within the sheet. Compared with N-doped graphene, the dopant-dopant bonds are less destructive in the present system. The reported results motivate efforts to synthesize highly B-doped graphene for semiconductor and catalytic applications. The theoretical predictions can be validated through direct chemical synthesis. PMID:27533648

  17. Pure and doped boron nitride nanotubes

    Directory of Open Access Journals (Sweden)

    M. Terrones

    2007-05-01

    Full Text Available More than ten years ago, it was suggested theoretically that boron nitride (BN nanotubes could be produced. Soon after, various reports on their synthesis appeared and a new area of nanotube science was born. This review aims to cover the latest advances related to the synthesis of BN nanotubes. We show that these tubes can now be produced in larger amounts and, in particular, that the chemistry of BN tubes appears to be very important to the production of reinforced composites with insulating characteristics. From the theoretical standpoint, we also show that (BN-C heteronanotubes could have important implications for nanoelectronics. We believe that BN nanotubes (pure and doped could be used in the fabrication of novel devices in which pure carbon nanotubes do not perform very efficiently.

  18. Spontaneous Boron-doping of Graphene at Room Temperature

    Science.gov (United States)

    Pan, Lida; Que, Yande; Du, Shixuan; Gao, Hongjun; Pantelides, Sokrates T.

    2015-03-01

    Doping graphene with boron or nitrogen is an effective way to modify its electronic properties. However, the reaction barrier for introducing these impurities is quite high, making the doping process difficult. In this work, we propose a low-energy reaction route derived from first-principles calculations and subsequently validated by experiments. The calculations show that, when graphene is placed on a ruthenium substrate and exposed to atomic boron, boron atoms can incorporate substitutionally into the graphene sheet with an energy barrier about 0.1 eV, displacing carbon atoms below the graphene sheet where they migrates away. This result suggests that spontaneous doping by boron can take place at room temperature. Following the prediction, we grew high-quality graphene on the Ru(0001) surface and then expose it to B2H6 which decomposes into atomic boron. XPS and STM results indicate that boron dopes graphene substantially without disturbing the graphene lattice, confirming the theoretical predictions. Doping by nitrogen and co-doping by B and N will also be discussed.

  19. Electrochemical synthesis on boron-doped diamond

    International Nuclear Information System (INIS)

    Boron-doped diamond (BDD) is a novel and innovative electrode material. In protic media and particular aqueous electrolytes BDD exhibits a large over potential for the evolution of molecular hydrogen and oxygen. The large chemical window allows a variety of electrochemical conversions to be conducted. The anodic process treatment generates oxyl species directly which are known to be extremely reactive. Usually, the electrochemical mineralization of the organic components in the electrolyte occurs. However, with control of the reactivity of these intermediates the use in electroorganic synthesis can be realized. Until today mostly anodic conversions have been studied at BDD. Since hydroxyl radicals can be efficiently formed and exhibit an enormous oxidative power they are exploited for the electroorganic synthesis. In general, two strategies can be applied to circumvent electrochemical incineration: First, the substrate serves as solvent and partial conversion exploits statistics to gain selectivity for the desired product. This particular approach is useful when the excess of substrate can subsequently be evaporated, and is readily available and inexpensive. The second strategy uses fluorinated alcohols as additives which enlarge the chemical window. The specific role of these fluorinated solvents can be attributed to the stabilization of hydroxyl or methoxyl radicals by supramolecular taming of these intermediates. Moreover, these additives paved the way to the first anodic phenol–arene cross-coupling reaction.

  20. Hydrogen adsorption on boron doped graphene: an {\\it ab initio} study

    OpenAIRE

    Miwa, R. H.; Martins, T B; Fazzio, A.

    2007-01-01

    The electronic and structural properties of (i) boron doped graphene sheets, and (ii) the chemisorption processes of hydrogen adatoms on the boron doped graphene sheets have been examined by {\\it ab initio} total energy calculations.

  1. Photoluminescence properties of boron doped InSe single crystals

    Energy Technology Data Exchange (ETDEWEB)

    Ertap, H., E-mail: huseyinertap@kafkas.edu.tr [Kafkas University, Faculty of Arts and Sciences, Department of Physics, 36100 Kars (Turkey); Bacıoğlu, A. [Hacattepe University, Department of Physics Engineering, 06800, Beytepe, Ankara (Turkey); Karabulut, M. [Kafkas University, Faculty of Arts and Sciences, Department of Physics, 36100 Kars (Turkey)

    2015-11-15

    Undoped and boron doped InSe single crystals were grown by Bridgman–Stockbarger technique. The PL properties of undoped, 0.1% and 0.5% boron doped InSe single crystals have been investigated at different temperatures. PL measurements revealed four emission bands labeled as A, B, C and D in all the single crystals studied. These emission bands were associated with the radiative recombination of direct free excitons (n=1), impurity-band transitions, donor–acceptor recombinations and structural defect related band (impurity atoms, defects, defect complexes, impurity-vacancy complex etc.), respectively. The direct free exciton (A) bands of undoped, 0.1% and 0.5% boron doped InSe single crystals were observed at 1.337 eV, 1.335 eV and 1.330 eV in the PL spectra measured at 12 K, respectively. Energy positions and PL intensities of the emission bands varied with boron addition. The FWHM of direct free exciton band increases while the FWHM of the D emission band decreases with boron doping. Band gap energies of undoped and boron doped InSe single crystals were calculated from the PL measurements. It was found that the band gap energies of InSe single crystals decreased with increasing boron content. - Highlights: • PL spectra of InSe crystals have been studied as a function of temperature. • Four emission bands were observed in the PL spectra at low temperatures. • PL intensity and position of free exciton band vary with doping and temperature. • Temperature dependences of the bands observed in the PL spectra were analyzed.

  2. The local structure of transition metal doped semiconducting boron carbides

    Energy Technology Data Exchange (ETDEWEB)

    Liu Jing; Dowben, P A [Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience, Behlen Laboratory of Physics, University of Nebraska-Lincoln, PO Box 880111, Lincoln, NE 68588-0111 (United States); Luo Guangfu; Mei Waining [Department of Physics, University of Nebraska at Omaha, Omaha, NE 68182-0266 (United States); Kizilkaya, Orhan [J. Bennett Johnston Sr. Center for Advanced Microstructures and Devices, Louisiana State University, 6980 Jefferson Hwy., Baton Rouge LA 70806 (United States); Shepherd, Eric D; Brand, J I [College of Engineering, and the Nebraska Center for Materials and Nanoscience, N209 Walter Scott Engineering Center, 17th and Vine Streets, University of Nebraska-Lincoln, Lincoln, NE 68588-0511 (United States)

    2010-03-03

    Transition metal doped boron carbides produced by plasma enhanced chemical vapour deposition of orthocarborane (closo-1,2-C{sub 2}B{sub 10}H{sub 12}) and 3d metal metallocenes were investigated by performing K-edge extended x-ray absorption fine structure and x-ray absorption near edge structure measurements. The 3d transition metal atom occupies one of the icosahedral boron or carbon atomic sites within the icosahedral cage. Good agreement was obtained between experiment and models for Mn, Fe and Co doping, based on the model structures of two adjoined vertex sharing carborane cages, each containing a transition metal. The local spin configurations of all the 3d transition metal doped boron carbides, Ti through Cu, are compared using cluster and/or icosahedral chain calculations, where the latter have periodic boundary conditions.

  3. Technology for boron-doped layers formation on the diamond

    Directory of Open Access Journals (Sweden)

    Zyablyuk K. N.

    2012-10-01

    Full Text Available The authors investigated natural type IIa diamond crystals and CVD diamond films. The article presents electrophysical parameters of the structures obtained in different modes of ion implantation of boron into the crystal with further annealing. Parameters of the crystals with a high nitrogen impurity density indicate that they can be used for the manufacture of microwave field-effect transistors operating at room temperature. CVD diamond films doped with boron during the growth process also have the required for MOSFET manufacture carrier mobility. However, due to the high activation energy of boron, the required channel conductivity is achieved at high operating temperatures.

  4. Boron and nitrogen doping in graphene antidot lattices

    Science.gov (United States)

    Brun, Søren J.; Pereira, Vitor M.; Pedersen, Thomas G.

    2016-06-01

    Bottom-up fabrication of graphene antidot lattices (GALs) has previously yielded atomically precise structures with subnanometer periodicity. Focusing on this type of experimentally realized GAL, we perform density functional theory calculations on the pristine structure as well as GALs with edge carbon atoms substituted with boron or nitrogen. We show that p - and n -type doping levels emerge with activation energies that depend on the level of hydrogenation at the impurity. Furthermore, a tight-binding parametrization together with a Green's function method are used to describe more dilute doping. Finally, random configurations of impurities in moderately doped systems are considered to show that the doping properties are robust against disorder.

  5. Influence of Boron doping on micro crystalline silicon growth

    Institute of Scientific and Technical Information of China (English)

    Li Xin-Li; Wang Guo; Chen Yong-Sheng; Yang Shi-E; Gu Jin-Hua; Lu Jing-Xiao; Gao Xiao-Yong; Li Rui; Jiao Yue-Chao; Gao Hai-Bo

    2011-01-01

    Microcrystalline silicon (Ftc-Si:H) thin films with and without boron doping are deposited using the radio-frequency plasmsrenhanced chemical vapour deposition method. The surface roughness evolutions of the silicon thin films are investigated using ex situ spectroscopic ellipsometry and an atomic force microscope. It is shown that the growth exponent β and the roughness exponent a are about 0.369 and 0.95 for the undoped thin film,respectively. Whereas,for the boron-doped pc-Si:H thin film,βincreases to 0.534 and a decreases to 0.46 due to the shadowing effect.

  6. Temperature admittance spectroscopy of boron doped chemical vapor deposition diamond

    Energy Technology Data Exchange (ETDEWEB)

    Zubkov, V. I., E-mail: VZubkovspb@mail.ru; Kucherova, O. V.; Zubkova, A. V.; Ilyin, V. A.; Afanas' ev, A. V. [St. Petersburg State Electrotechnical University (LETI), Professor Popov Street 5, 197376 St. Petersburg (Russian Federation); Bogdanov, S. A.; Vikharev, A. L. [Institute of Applied Physics of the Russian Academy of Sciences, Ul' yanov Street 46, 603950 Nizhny Novgorod (Russian Federation); Butler, J. E. [St. Petersburg State Electrotechnical University (LETI), Professor Popov Street 5, 197376 St. Petersburg (Russian Federation); Institute of Applied Physics of the Russian Academy of Sciences, Ul' yanov Street 46, 603950 Nizhny Novgorod (Russian Federation); National Museum of Natural History (NMNH), P.O. Box 37012 Smithsonian Inst., Washington, D.C. 20013-7012 (United States)

    2015-10-14

    Precision admittance spectroscopy measurements over wide temperature and frequency ranges were carried out for chemical vapor deposition epitaxial diamond samples doped with various concentrations of boron. It was found that the experimentally detected boron activation energy in the samples decreased from 314 meV down to 101 meV with an increase of B/C ratio from 600 to 18000 ppm in the gas reactants. For the heavily doped samples, a transition from thermally activated valence band conduction to hopping within the impurity band (with apparent activation energy 20 meV) was detected at temperatures 120–150 K. Numerical simulation was used to estimate the impurity DOS broadening. Accurate determination of continuously altering activation energy, which takes place during the transformation of conduction mechanisms, was proposed by numerical differentiation of the Arrhenius plot. With increase of boron doping level the gradual decreasing of capture cross section from 3 × 10{sup −13} down to 2 × 10{sup −17} cm{sup 2} was noticed. Moreover, for the hopping conduction the capture cross section becomes 4 orders of magnitude less (∼2 × 10{sup −20} cm{sup 2}). At T > T{sub room} in doped samples the birth of the second conductance peak was observed. We attribute it to a defect, related to the boron doping of the material.

  7. Superconductivity in heavily boron-doped silicon carbide

    Directory of Open Access Journals (Sweden)

    Markus Kriener, Takahiro Muranaka, Junya Kato, Zhi-An Ren, Jun Akimitsu and Yoshiteru Maeno

    2008-01-01

    Full Text Available The discoveries of superconductivity in heavily boron-doped diamond in 2004 and silicon in 2006 have renewed the interest in the superconducting state of semiconductors. Charge-carrier doping of wide-gap semiconductors leads to a metallic phase from which upon further doping superconductivity can emerge. Recently, we discovered superconductivity in a closely related system: heavily boron-doped silicon carbide. The sample used for that study consisted of cubic and hexagonal SiC phase fractions and hence this led to the question which of them participated in the superconductivity. Here we studied a hexagonal SiC sample, free from cubic SiC phase by means of x-ray diffraction, resistivity, and ac susceptibility.

  8. Boron-doped superlattices and Bragg mirrors in diamond

    OpenAIRE

    Fiori, Alexandre; Bousquet, Jessica; Eon, David; Omnès, Franck; Bellet-Amalric, E.; Bustarret, Etienne

    2014-01-01

    International audience A periodic modulation of the boron doping level of single crystal diamond multilayers over more than three orders of magnitude during epitaxial growth by microwave plasma-enhanced chemical vapor deposition is shown to yield Bragg mirrors in the visible. The thicknesses and doping level of the individual layers were controlled by in situ spectroscopic ellipsometry, enabling to tune the reflec-tance peak to the wavelength range of diamond color centers, such as NV 0 or...

  9. Innovative boron nitride-doped propellants

    OpenAIRE

    Thelma Manning; Richard Field; Kenneth Klingaman; Michael Fair; John Bolognini; Robin Crownover; Carlton P. Adam; Viral Panchal; Eugene Rozumov; Henry Grau; Paul Matter; Michael Beachy; Christopher Holt; Samuel Sopok

    2016-01-01

    The U.S. military has a need for more powerful propellants with balanced/stoichiometric amounts of fuel and oxidants. However, balanced and more powerful propellants lead to accelerated gun barrel erosion and markedly shortened useful barrel life. Boron nitride (BN) is an interesting potential additive for propellants that could reduce gun wear effects in advanced propellants (US patent pending 2015-026P). Hexagonal boron nitride is a good lubricant that can provide wear resistance and lower ...

  10. Dependence of transport properties in tunnel junction on boron doping

    Energy Technology Data Exchange (ETDEWEB)

    Shi, M.J.; Zeng, X.B.; Liu, S.Y.; Peng, W.B; Xiao, H.B; Liao, X.B.; Wang, Z.G.; Kong, G.L. [Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

    2010-04-15

    Boron-doped hydrogenated silicon films with different gaseous doping ratio (B{sub 2}H{sub 6}/SiH{sub 4}) were fabricated as recombination p layers in tunnel junctions. The measurements of I-V characteristics of the junctions and transparency spectra of p layer indicated that the best gaseous doping ratio of the recombination layer is 0.04, which is correlated to the degradation of short range order (SRO) in the inserted p thin film. The junction with such recombination layer has small resistance, near ohmic contact. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  11. Thermal diffusion boron doping of single-crystal natural diamond

    Science.gov (United States)

    Seo, Jung-Hun; Wu, Henry; Mikael, Solomon; Mi, Hongyi; Blanchard, James P.; Venkataramanan, Giri; Zhou, Weidong; Gong, Shaoqin; Morgan, Dane; Ma, Zhenqiang

    2016-05-01

    With the best overall electronic and thermal properties, single crystal diamond (SCD) is the extreme wide bandgap material that is expected to revolutionize power electronics and radio-frequency electronics in the future. However, turning SCD into useful semiconductors requires overcoming doping challenges, as conventional substitutional doping techniques, such as thermal diffusion and ion implantation, are not easily applicable to SCD. Here we report a simple and easily accessible doping strategy demonstrating that electrically activated, substitutional doping in SCD without inducing graphitization transition or lattice damage can be readily realized with thermal diffusion at relatively low temperatures by using heavily doped Si nanomembranes as a unique dopant carrying medium. Atomistic simulations elucidate a vacancy exchange boron doping mechanism that occurs at the bonded interface between Si and diamond. We further demonstrate selectively doped high voltage diodes and half-wave rectifier circuits using such doped SCD. Our new doping strategy has established a reachable path toward using SCDs for future high voltage power conversion systems and for other novel diamond based electronic devices. The novel doping mechanism may find its critical use in other wide bandgap semiconductors.

  12. Boron doping of silicon using excimer lasers

    International Nuclear Information System (INIS)

    The use of lasers in the doping of semiconductors has been investigated extensively these last years both for photovoltaic and microelectronic applications. In this work, doping of single-crystal silicon in BCl3 ambients using a pulsed UV laser has been studied as a function of laser wavelength and fluence in order to investigate the effects of photochemical decomposition of the BCl3 gas and the effects of thermal decomposition of adsorbed layers on the doping process. Different parameters involved in the process (laser energy density, number of pulses per frame, BCl3 gas pressure) were investigated. The electrical characteristics of the doped layers are discussed

  13. Hydrogen adsorption on nitrogen and boron doped graphene

    International Nuclear Information System (INIS)

    Hydrogen adsorption on boron and nitrogen doped graphene is investigated in detail by means of first-principles calculations. A comprehensive study is performed of the structural, electronic, and magnetic properties of chemisorbed hydrogen atoms and atom pairs near the dopant sites. The main effect of the substitutional atoms is charge doping which is found to greatly affect the adsorption process by increasing the binding energy at the sites closest to the substitutional species. It is also found that doping does not induce magnetism despite the odd number of electrons per atom introduced by the foreign species, and that it quenches the paramagnetic response of chemisorbed H atoms on graphene. Overall, the effects are similar for B and N doping, with only minor differences in the adsorption energetics due to different sizes of the dopant atoms and the accompanying lattice distortions. (paper)

  14. Magnesium doping of boron nitride nanotubes

    Science.gov (United States)

    Legg, Robert; Jordan, Kevin

    2015-06-16

    A method to fabricate boron nitride nanotubes incorporating magnesium diboride in their structure. In a first embodiment, magnesium wire is introduced into a reaction feed bundle during a BNNT fabrication process. In a second embodiment, magnesium in powder form is mixed into a nitrogen gas flow during the BNNT fabrication process. MgB.sub.2 yarn may be used for superconducting applications and, in that capacity, has considerably less susceptibility to stress and has considerably better thermal conductivity than these conventional materials when compared to both conventional low and high temperature superconducting materials.

  15. Photoluminescence Characterization of Boron-doped Si Layers Grown by Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    LI Cheng; LAI Hong-kai; CHEN Song-yan

    2005-01-01

    Photoluminescence spectra were used to characterize the boron-doped Si layers grown by molecular beam epitaxy using HBO2 as the doping source. The influence of boron doping concentration on the dislocation-related photoluminescence spectra of molecular beam epitaxy Si layers annealed at 900 ℃ was studied with different doping concentrations and growth temperature. The broad photoluminescence band(from 0.75 eV to 0.90 eV) including D1 and D2 bands was associated with high boron doping concentration in the samples, while D3 and D4 bands might be related to oxygen precipitates.

  16. ESR and Microwave Absorption in Boron Doped Diamond Single Crystals

    Science.gov (United States)

    Timms, Christopher

    2015-03-01

    Superconductivity has been reportedly found in boron-doped diamond. Most research to date has only studied superconductivity in polycrystalline and thin film boron-diamonds, as opposed to a single crystal. In fact, only one other group has examined a macro scale boron-doped diamond crystal. Our group has successfully grown large single crystals by using the High Temperature High Pressure method (HTHP) and observed a transition to metallic and superconducting states for high B concentrations. For the present, we are studying BDD crystal using Electron Spin Resonance. We conducted our ESR analysis over a range of temperatures (2K to 300K) and found several types of signals, proving the existence of charge carriers with spin 1/2 in BDD. Moreover, we have found that with increasing B concentrations, from n ~ 1018 cm-3 to n of over 1020 cm-3, the ESR signal changes from that of localized spins to the Dysonian shape of free carriers. The low magnetic field microwave absorption has also been studied in BDD samples at various B concentrations and the clear transition to superconducting state has been found below Tc that ranges from 2K to 4 K depending on concentration and quality of crystal. Sergey Polyakov, Victor Denisov, Vladimir Blank, Ray Baughman, Anvar Zakhidov.

  17. Growth and characterization of boron doped graphene by Hot Filament Chemical Vapor Deposition Technique (HFCVD)

    Science.gov (United States)

    Jafari, A.; Ghoranneviss, M.; Salar Elahi, A.

    2016-03-01

    Large-area boron doped graphene was synthesized on Cu foil (as a catalyst) by Hot Filament Chemical Vapor Deposition (HFCVD) using boron oxide powder and ethanol vapor. To investigate the effect of different boron percentages, grow time and the growth mechanism of boron-doped graphene, scanning electron microscopy (SEM), Raman scattering and X-ray photoelectron spectroscopy (XPS) were applied. Also in this experiment, the I-V characteristic carried out for study of electrical property of graphene with keithley 2361 system. Nucleation of graphene domains with an average domain size of ~20 μm was observed when the growth time is 9 min that has full covered on the Cu surface. The Raman spectroscopy show that the frequency of the 2D band down-shifts with B doping, consistent with the increase of the in-plane lattice constant, and a weakening of the B-C in-plane bond strength relative to that of C-C bond. Also the shifts of the G-band frequencies can be interpreted in terms of the size of the C-C ring and the changes in the electronic structure of graphene in the presence of boron atoms. The study of electrical property shows that by increasing the grow time the conductance increases which this result in agree with SEM images and graphene grain boundary. Also by increasing the boron percentage in gas mixer the conductance decreases since doping graphene with boron creates a band-gap in graphene band structure. The XPS results of B doped graphene confirm the existence of boron in doped graphene, which indicates the boron atoms doped in the graphene lattice are mainly in the form of BC3. The results showed that boron-doped graphene can be successfully synthesized using boron oxide powder and ethanol vapor via a HFCVD method and also chemical boron doping can be change the electrical conductivity of the graphene.

  18. Plasma-induced high efficient synthesis of boron doped reduced graphene oxide for supercapacitors

    DEFF Research Database (Denmark)

    Li, Shaobo; Wang, Zhaofeng; Jiang, Hanmei;

    2016-01-01

    In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions. The doping of boron (1.4 at%) led to a significant improvement in the capacitance of rGO and supercapacitors...

  19. CVD Delta-Doped Boron Surface Layers for Ultra-Shallow Junction Formation

    NARCIS (Netherlands)

    Sarubbi, F.; Nanver, L.K.; Scholtes, T.L.M.

    2006-01-01

    A new doping technique is presented that uses a pure boron atmospheric/low-pressure chemical vapor deposition (AP/LPCVD) in a commercially available epitaxial reactor to form less than 2-nm-thick δ-doped boron-silicide (BxSi) layers on the silicon surface. For long exposure B segregates at the surfa

  20. The boron doping of single crystal diamond for high power diode applications

    Science.gov (United States)

    Nicley, Shannon Singer

    Diamond has the potential to revolutionize the field of high power and high frequency electronic devices as a superlative electronic material. The realization of diamond electronics depends on the control of the growth process of both lightly and heavily boron doped diamond. This dissertation work is focused on furthering the state of the art of boron doped diamond (BDD) growth toward the realization of high power diamond Schottky barrier diodes (SBDs). The achievements of this work include the fabrication of a new dedicated reactor for lightly boron doped diamond deposition, the optimization of growth processes for both heavily and lightly boron doped single crystal diamond (SCD), and the proposal and realization of the corner architecture SBD. Boron doped SCD is grown in microwave plasma-assisted chemical vapor deposition (MPACVD) plasma disc bell-jar reactors, with feedgas mixtures including hydrogen, methane, carbon dioxide, and diborane. Characterization methods for the analysis of BDD are described, including Fourier-transformed infrared spectroscopy (FTIR), Secondary Ion Mass Spectroscopy (SIMS) and temperature-dependent four point probe conductivity for activation energy. The effect of adding carbon dioxide to the plasma feedgas for lightly boron doped diamond is investigated. The effect of diborane levels and other growth parameters on the incorporated boron levels are reported, and the doping efficiency is calculated over a range of boron concentrations. The presence of defects is shown to affect the doping uniformity. The substrate growth temperature dependence of the plasma gas-phase to solid-phase doping efficiency in heavily boron doped SCD deposition is investigated. The substrate temperature during growth is shown to have a significant effect on the grown sample defect morphology, and a temperature dependence of the doping efficiency is also shown. The effect of the growth rate on the doping efficiency is discussed, and the ratio of the boron

  1. Reverse annealing of boron doped polycrystalline silicon

    International Nuclear Information System (INIS)

    Thermal activation was carried out using polycrystalline silicon (poly-Si) produced through sequential-lateral-solidification or excimer-laser-crystallization (ELC) after B+ ion shower doping. The activation efficiency of the ELC samples was found to be higher than that of the SLS ones. In this regard, grain boundaries seemed to play a critical role in terms of the activation of dopants in poly-Si at low temperatures. Reverse annealing, in which a continuous loss of charge carriers occurs, was found in this study at temperatures ranging between 400 oC and 650 oC. The samples treated by rapid thermal annealing showed a lower sheet resistance than those treated by furnace annealing. Rapid thermal annealing was found to exhibit a higher activation efficiency than furnace annealing. Reverse annealing is believed to play an important role in terms of activation efficiency

  2. Reverse annealing of boron doped polycrystalline silicon

    Energy Technology Data Exchange (ETDEWEB)

    Jin, Beop-Jong; Hong, Won-Eui [Department of Materials Science and Engineering, Hongik University, Seoul, 121-791 (Korea, Republic of); Kim, Deok Hoi; Uemoto, Tstomu; Kim, Chi Woo [LTPS Team, AMLCD Business, Samsung Electronics, Yongin-City, Gyeonggi-Do, 449-711 (Korea, Republic of); Ro, Jae-Sang [Department of Materials Science and Engineering, Hongik University, Seoul, 121-791 (Korea, Republic of)], E-mail: jsang@wow.hongik.ac.kr

    2008-07-31

    Thermal activation was carried out using polycrystalline silicon (poly-Si) produced through sequential-lateral-solidification or excimer-laser-crystallization (ELC) after B{sup +} ion shower doping. The activation efficiency of the ELC samples was found to be higher than that of the SLS ones. In this regard, grain boundaries seemed to play a critical role in terms of the activation of dopants in poly-Si at low temperatures. Reverse annealing, in which a continuous loss of charge carriers occurs, was found in this study at temperatures ranging between 400 {sup o}C and 650 {sup o}C. The samples treated by rapid thermal annealing showed a lower sheet resistance than those treated by furnace annealing. Rapid thermal annealing was found to exhibit a higher activation efficiency than furnace annealing. Reverse annealing is believed to play an important role in terms of activation efficiency.

  3. Tuning the optical response in carbon doped boron nitride nanodots

    KAUST Repository

    Mokkath, Junais Habeeb

    2014-09-04

    Time dependent density functional theory and the hybrid B3LYP functional are used to investigate the structural and optical properties of pristine and carbon doped hexagonal boron nitride nanodots. In agreement with recent experiments, the embedded carbon atoms are found to favor nucleation. Our results demonstrate that carbon clusters of different shapes promote an early onset of absorption by generating in-gap states. The nanodots are interesting for opto-electronics due to their tunable optical response in a wide energy window. We identify cluster sizes and shapes with optimal conversion efficiency for solar radiation and a wide absorption range form infrared to ultraviolet. This journal is

  4. Graphitized boron-doped carbon foams: Performance as anodes in lithium-ion batteries

    Energy Technology Data Exchange (ETDEWEB)

    Rodriguez, Elena; Camean, Ignacio; Garcia, Roberto [Instituto Nacional del Carbon (CSIC), C/Francisco Pintado Fe 26, 33011 Oviedo (Spain); Garcia, Ana B., E-mail: anabgs@incar.csic.es [Instituto Nacional del Carbon (CSIC), C/Francisco Pintado Fe 26, 33011 Oviedo (Spain)

    2011-05-30

    Highlights: > Because of the catalytic effect of boron, graphite-like foams were prepared. > The presence of substitutional boron in carbon foams improves their anodic performance. > The graphitized boron-doped foams provide reversible capacities of 310 mA h g{sup -1}. - Abstract: The electrochemical performance as potential anodes in lithium-ion batteries of several boron-doped and non-doped graphitic foams with different degree of structural order was investigated by galvanostatic cycling. The boron-doped foams were prepared by the co-pyrolysis of a coal and two boron sources (boron oxide and a borane-pyridine complex), followed by heat treatment in the 2400-2800 deg. C temperature interval. The extent of the graphitization process of the carbon foams depends on boron concentration and source. Because of the catalytic effect of boron, lightweight graphite-like foams were prepared. Boron in the foams was found to be present as carbide (B{sub 4}C), in substitutional positions in the carbon lattice (B-C), bonded to nitrogen (B-N) and forming clusters. Larger reversible lithium storage capacities with values up to {approx}310 mA h g{sup -1} were achieved by using the boron oxide-based carbon foams. Moreover, since the electrochemical anodic performance of these boron-doped foams with different degree of structural order is similar, the beneficial effect of the presence of the B-C boron phase was inferred. However, the bonding of boron with nitrogen in the pyridine borane-based has a negative effect on lithium intercalation.

  5. Boron doped simulated graphene field effect transistor model

    Science.gov (United States)

    Sharma, Preetika; Kaur, Inderpreet; Gupta, Shuchi; Singh, Sukhbir

    2016-05-01

    Graphene based electronic devices due to its unique properties has transformed electronics. A Graphene Field Effect Transistor (GNRFET) model is simulated in Virtual Nano Lab (VNL) and the calculations are based on density functional theory (DFT). Simulations were performed on this pristine GNRFET model and the transmission spectrum was observed. The graph obtained showed a uniform energy gap of +1 to -1eV and the highest transmission peak at -1.75 eV. To this pristine model of GNRFET, doping was introduced and its effect was seen on the Fermi level obtained in the transmission spectrum. Boron as a dopant was used which showed variations in both the transmission peaks and the energy gap. In this model, first the single boron was substituted in place of carbon and Fermi level showed an energy gap of 1.5 to -0.5eV with the highest transmission peak at -1.3 eV. In another variation in the model, two carbon atoms were replaced by two boron atoms and Fermi level shifted from 2 to 0.25eV. In this observation, the highest transmission peak was observed at -1(approx.). The use of nanoelectronic devices have opened many areas of applications as GFET is an excellent building block for electronic circuits, and is being used in applications such as high-performance frequency doublers and mixers, digital modulators, phase detectors, optoelectronics and spintronics.

  6. Microheater made of heavily boron doped single crystal silicon beam

    International Nuclear Information System (INIS)

    Microheater made of heavily Boron doped single crystal Si beam covered with SiO2 film, 1000 x 300 x 3 μm, is fabricated on the n type Si substrate by the anisotropic etching technique. As this microheater has an air bridge structure of low resistivity semiconductor material with positive but small temperature coefficient of resistance, a broad heating area up to 800 degrees C is easily obtained and it has quick response with the thermal time constant t of about 4 ms and has small power consumption. Since this heating area is made of p type layer in the n type substrate, this area can be electrically isolated from the substrate because of the formation of p-n junction

  7. Boron doped diamond electrodes in voltammetry: new designs and applications (an overview)

    OpenAIRE

    Zavázalová, Jaroslava; Barek, Jiří; Pecková, Karolina

    2014-01-01

    In this overview, the recent progress in the development and applications of bare boron doped diamond electrodes in voltammetry of organic compounds is summarized. Attention is paid to important issues reflected in last five years in electroanalytical studies, e.g. fouling and pretreatment of BDD surface, influence of boron concentration on performance of BDD-based sensors, and application of adsorptive stripping voltammetry.

  8. Theoretical Calculation on Optimum Si-doping Content in Boron Carbide Thin Film

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    The theoretical expression of the relationship between optimum doping content and crystal structure is presented as well as the preparation methods. By using this expression, the optimum doping content of silicon-doped boron carbide thin film is calculated. The quantitative calculation value is consistent with the experimental results. This theoretical expression is also appropriate to resolve the optimum doping content for other electric materials.

  9. Cytotoxicity of Boron-Doped Nanocrystalline Diamond Films Prepared by Microwave Plasma Chemical Vapor Deposition

    Science.gov (United States)

    Liu, Dan; Gou, Li; Ran, Junguo; Zhu, Hong; Zhang, Xiang

    2015-07-01

    Boron-doped nanocrystalline diamond (NCD) exhibits extraordinary mechanical properties and chemical stability, making it highly suitable for biomedical applications. For implant materials, the impact of boron-doped NCD films on the character of cell growth (i.e., adhesion, proliferation) is very important. Boron-doped NCD films with resistivity of 10-2 Ω·cm were grown on Si substrates by the microwave plasma chemical vapor deposition (MPCVD) process with H2 bubbled B2O3. The crystal structure, diamond character, surface morphology, and surface roughness of the boron-doped NCD films were analyzed using different characterization methods, such as X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM). The contact potential difference and possible boron distribution within the film were studied with a scanning kelvin force microscope (SKFM). The cytotoxicity of films was studied by in vitro tests, including fluorescence microscopy, SEM and MTT assay. Results indicated that the surface roughness value of NCD films was 56.6 nm and boron was probably accumulated at the boundaries between diamond agglomerates. MG-63 cells adhered well and exhibited a significant growth on the surface of films, suggesting that the boron-doped NCD films were non-toxic to cells. supported by the Open Foundation of State Key Laboratory of Electronic Thin Films and Integrated Devices (University of Electronic Science and Technology of China) (No. KFJJ201313)

  10. Plasma-induced highly efficient synthesis of boron doped reduced graphene oxide for supercapacitors.

    Science.gov (United States)

    Li, Shaobo; Wang, Zhaofeng; Jiang, Hanmei; Zhang, Limei; Ren, Jingzheng; Zheng, Mingtao; Dong, Lichun; Sun, Luyi

    2016-09-21

    In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions. The doping of boron (1.4 at%) led to a significant improvement in the capacitance of rGO and supercapacitors based on the as-synthesized B-rGO exhibited an outstanding specific capacitance.

  11. Electrochemical oxygen transfer reaction on synthetic boron-doped diamond thin film electrode

    OpenAIRE

    Marselli, Béatrice; Comninellis, Christos

    2005-01-01

    Synthetic boron-doped diamond thin film is a new promising anode material. Because of its properties (high anodic stability under drastic conditions and wide potential window), it is widely investigated for numerous possible electrochemical applications such as electrosynthesis, preparation of powerful oxidants and electroincineration. In the first part of this work, simple charge transfer was investigated at boron-doped diamond electrode through the study of an outer sphere system in the pot...

  12. Plasma-induced highly efficient synthesis of boron doped reduced graphene oxide for supercapacitors.

    Science.gov (United States)

    Li, Shaobo; Wang, Zhaofeng; Jiang, Hanmei; Zhang, Limei; Ren, Jingzheng; Zheng, Mingtao; Dong, Lichun; Sun, Luyi

    2016-09-21

    In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions. The doping of boron (1.4 at%) led to a significant improvement in the capacitance of rGO and supercapacitors based on the as-synthesized B-rGO exhibited an outstanding specific capacitance. PMID:27534806

  13. Electrical Characterization of Diamond/Boron Doped Diamond Nanostructures for Use in Harsh Environment Applications

    Science.gov (United States)

    Gołuński, Ł.; Zwolski, K.; Płotka, P.

    2016-01-01

    The polycrystalline boron doped diamond (BDD) shows stable electrical properties and high tolerance for harsh environments (e.g. high temperature or aggressive chemical compounds) comparing to other materials used in semiconductor devices. In this study authors have designed electronic devices fabricated from non-intentionally (NiD) films and highly boron doped diamond structures. Presented semiconductor devices consist of highly boron doped structures grown on NiD diamond films. Fabricated structures were analyzed by electrical measurements for use in harsh environment applications. Moreover, the boron-doping level and influence of oxygen content on chemical composition of diamond films were particularly investigated. Microwave Plasma Enhanced Chemical Vapour Deposition (MW PE CVD) has been used for thin diamond films growth. Non-intentionally doped diamond (0 ppm [B]/[C]) films have been deposited on the Si/SiO2 wafers with different content of carbon, boron and oxygen in the gas phase. Then, the shape of the highly doped diamond structures were obtained by pyrolysis of SiO2 on NiD film and standard lithography process. The highly doped structures were obtained for different growth time and [B]/[C] ratio (4000 - 10000 ppm). The narrowest distance between two highly doped structures was 5pm. The standard Ti/Au ohmic contacts were deposited using physical vapour deposition for electrical characterization of NiD/BDD devices. The influence of diffusion boron from highly doped diamond into non-doped/low-doped diamond film was investigated. Surface morphology of designed structures was analyzed by Scanning Electron Microscope and optical microscope. The resistivity of the NiD and film was studied using four-point probe measurements also DC studies were done.

  14. Effects of carbon doping on the electronic properties of boron nitride nanotubes: Tight binding calculation

    Science.gov (United States)

    Chegel, Raad

    2016-10-01

    The electronic properties of pure and carbon doped zigzag and armchair Boron Nitride Nanotubes (BNNTs) have been investigated based on tight binding formalism. It was found that the band gap is reduced due to substitution of Boron or Nitrogen atoms by carbon atoms and the doping effects of B- and N-substituted BNNTs are different. The applied electric field converts the carbon doped BNNTs from semiconductor to metal. The gap energy reduction shows an identical dependence to electric field and doping for both armchair and zigzag carbon doped BNNTs. Our results indicate that the band gap of carbon doped BNNTs is a function of the Impurity concentration, electric field strength and the direction between the electric field and dopant location. The band gap for C-doped BNNTs with four carbon atoms decreases linearly but for two carbon atoms, it is constant at first then decreases linearly.

  15. Local atomic and electronic structure of boron chemical doping in monolayer graphene.

    Science.gov (United States)

    Zhao, Liuyan; Levendorf, Mark; Goncher, Scott; Schiros, Theanne; Pálová, Lucia; Zabet-Khosousi, Amir; Rim, Kwang Taeg; Gutiérrez, Christopher; Nordlund, Dennis; Jaye, Cherno; Hybertsen, Mark; Reichman, David; Flynn, George W; Park, Jiwoong; Pasupathy, Abhay N

    2013-10-01

    We use scanning tunneling microscopy and X-ray spectroscopy to characterize the atomic and electronic structure of boron-doped and nitrogen-doped graphene created by chemical vapor deposition on copper substrates. Microscopic measurements show that boron, like nitrogen, incorporates into the carbon lattice primarily in the graphitic form and contributes ~0.5 carriers into the graphene sheet per dopant. Density functional theory calculations indicate that boron dopants interact strongly with the underlying copper substrate while nitrogen dopants do not. The local bonding differences between graphitic boron and nitrogen dopants lead to large scale differences in dopant distribution. The distribution of dopants is observed to be completely random in the case of boron, while nitrogen displays strong sublattice clustering. Structurally, nitrogen-doped graphene is relatively defect-free while boron-doped graphene films show a large number of Stone-Wales defects. These defects create local electronic resonances and cause electronic scattering, but do not electronically dope the graphene film. PMID:24032458

  16. Structures of Pt clusters on graphene doped with nitrogen, boron, and silicon: a theoretical study

    Institute of Scientific and Technical Information of China (English)

    Dai Xian-Qi; Tang Ya-Nan; Dai Ya-Wei; Li Yan-Hui; Zhao Jian-Hua; Zhao Bao; Yang Zong-Xian

    2011-01-01

    The structures of Pt clusters on nitrogen-, boron-, silicon- doped graphenes are theoretically studied using densityfunctional theory. These dopants (nitrogen, boron and silicon) each do not induce a local curvature in the graphene and the doped graphenes all retain their planar form. The formation energy of the silicon-graphene system is lower than those of the nitrogen-, boron-doped graphenes, indicating that the silicon atom is easier to incorporate into the graphene.All the substitutional impurities enhance the interaction between the Pt atom and the graphene. The adsorption energy of a Pt adsorbed on the silicon-doped graphene is much higher than those on the nitrogen- and boron-doped graphenes.The doped silicon atom can provide more charges to enhance the Pt-graphene interaction and the formation of Pt clusters each with a large size. The stable structures of Pt clusters on the doped-graphenes are dimeric, triangle and tetrahedron with the increase of the Pt coverage. Of all the studied structures, the tetrahedron is the most stable cluster which has the least influence on the planar surface of doped-graphene.

  17. Photoluminescence and Raman spectroscopy characterization of boron- and nitrogen-doped 6H silicon carbide

    DEFF Research Database (Denmark)

    Ou, Yiyu; Jokubavicius, Valdas; Liu, Chuan;

    2011-01-01

    Boron - and nitrogen-doped 6H silicon carbide epilayers grown on low off-axis 6H silicon carbide substrates have been characterized by photoluminescence and Raman spectroscopy. Combined with secondary ion mass spectrometry results, preferable doping type and optimized concentration could...

  18. The effect of substrate temperature and growth rate on the doping efficiency of single crystal boron doped diamond

    Energy Technology Data Exchange (ETDEWEB)

    Demlow, SN; Rechenberg, R; Grotjohn, T

    2014-10-01

    The substrate growth temperature dependence of the plasma gas-phase to solid-phase doping efficiency in single crystal, boron doped diamond (BDD) deposition is investigated. Single crystal diamond (SCD) is grown by microwave plasma assisted chemical vapor deposition (MPACVD) on high pressure, high temperature (HPHT) type Ib substrates. Samples are grown at substrate temperatures of 850-950 degrees C for each of five doping concentration levels, to determine the effect of the growth temperature on the doping efficiency and defect morphology. The substrate temperature during growth is shown to have a significant effect on the grown sample defect morphology, and a temperature dependence of the doping efficiency is also shown. The effect of the growth rate on the doping efficiency is discussed, and the ratio of the boron concentration in the gas phase to the flux of carbon incorporated into the solid diamond phase is shown to be a more predictive measure of the resulting boron concentration than the gas phase boron to carbon ratio that is more commonly reported. (C) 2014 Elsevier B.V. All rights reserved.

  19. Optical and electrical properties of undoped and boron doped zinc oxide synthesized by chemical route

    International Nuclear Information System (INIS)

    We have synthesized and studied the boron doped ZnO nanostructure thin films. The crystallinity of undoped and boron (B) doped ZnO (BZO) has been studied from XRD results. Using the Debye-Scherrer Formula, the grain size has been evaluated, which was found to decrease with increased doping concentration. The optical and electrical properties of (1, 3, 5 wt%) B-doped ZnO (BZO) has been investigated with reference to the undoped counterpart. The UV-VIS spectroscopic analysis revealed that the transmittance for undoped ZnO is maximum and it decreases with doping up to 3% but increases for 5% BZO. The dark as well as photo current–voltage (I–V) characteristics have been investigated in details and the changes occurred in the I-V characteristics with doping concentration as well as under illumination are also quite significant

  20. Synthesis of boron-doped graphene monolayers using the sole solid feedstock by chemical vapor deposition.

    Science.gov (United States)

    Wang, Huan; Zhou, Yu; Wu, Di; Liao, Lei; Zhao, Shuli; Peng, Hailin; Liu, Zhongfan

    2013-04-22

    Substitutionally boron-doped monolayer graphene film is grown on a large scale by using a sole phenylboronic acid as the source in a low-pressure chemical vapor deposition system. The B-doped graphene film is a homogeneous monolayer with high crystalline quality, which exhibits a stable p-type doping behavior with a considerably high room-temperature carrier mobility of about 800 cm(2) V(-1) s(-1) . PMID:23463717

  1. Boron Doped Nanocrystalline Diamond Films for Biosensing Applications

    Directory of Open Access Journals (Sweden)

    V. Petrák

    2011-01-01

    Full Text Available With the rise of antibiotic resistance of pathogenic bacteria there is an increased demand for monitoring the functionality of bacteria membranes, the disruption of which can be induced by peptide-lipid interactions. In this work we attempt to construct and disrupt supported lipid membranes (SLB on boron doped nanocrystalline diamond (B-NCD. Electrochemical Impedance Spectroscopy (EIS was used to study in situ changes related to lipid membrane formation and disruption by peptide-induced interactions. The observed impedance changes were minimal for oxidized B-NCD samples, but were still detectable in the low frequency part of the spectra. The sensitivity for the detection of membrane formation and disruption was significantly higher for hydrogenated B-NCD surfaces. Data modeling indicates large changes in the electrical charge when an electrical double layer is formed at the B-NCD/SLB interface, governed by ion absorption. By contrast, for oxidized B-NCD surfaces, these changes are negligible indicating little or no change in the surface band bending profile.

  2. Metal-insulator transition and superconductivity in heavily boron-doped diamond and related materials

    Energy Technology Data Exchange (ETDEWEB)

    Achatz, Philipp

    2009-05-15

    During this PhD project, the metal-insulator transition and superconductivity of highly boron-doped single crystal diamond and related materials have been investigated. The critical boron concentration n{sub c} for the metal-insulator transition was found to be the same as for the normal-superconductor transition. All metallic samples have been found to be superconducting and we were able to link the occurence of superconductivity to the proximity to the metal-insulator transition. For this purpose, a scaling law approach based on low temperature transport was proposed. Furthermore, we tried to study the nature of the superconductivity in highly boron doped single crystal diamond. Raman spectroscopy measurements on the isotopically substituted series suggest that the feature occuring at low wavenumbers ({approx} 500 cm{sup -1}) is the A1g vibrational mode associated with boron dimers. Usual Hall effect measurements yielded a puzzling situation in metallic boron-doped diamond samples, leading to carrier concentrations up to a factor 10 higher than the boron concentration determined by secondary ion mass spectroscopy (SIMS). The low temperature transport follows the one expected for a granular metal or insulator, depending on the interplay of intergranular and intragranular (tunneling) conductance. The metal-insulator transition takes place at a critical conductance g{sub c}. The granularity also influences significantly the superconducting properties by introducing the superconducting gap {delta} in the grain and Josephson coupling J between superconducting grains. A peak in magnetoresistance is observed which can be explained by superconducting fluctuations and the granularity of the system. Additionally we studied the low temperature transport of boron-doped Si samples grown by gas immersion laser doping, some of which yielded a superconducting transition at very low temperatures. Furthermore, preliminary results on the LO-phonon-plasmon coupling are shown for the

  3. Metal-insulator transition and superconductivity in heavily boron-doped diamond and related materials

    International Nuclear Information System (INIS)

    During this PhD project, the metal-insulator transition and superconductivity of highly boron-doped single crystal diamond and related materials have been investigated. The critical boron concentration nc for the metal-insulator transition was found to be the same as for the normal-superconductor transition. All metallic samples have been found to be superconducting and we were able to link the occurence of superconductivity to the proximity to the metal-insulator transition. For this purpose, a scaling law approach based on low temperature transport was proposed. Furthermore, we tried to study the nature of the superconductivity in highly boron doped single crystal diamond. Raman spectroscopy measurements on the isotopically substituted series suggest that the feature occuring at low wavenumbers (∼ 500 cm-1) is the A1g vibrational mode associated with boron dimers. Usual Hall effect measurements yielded a puzzling situation in metallic boron-doped diamond samples, leading to carrier concentrations up to a factor 10 higher than the boron concentration determined by secondary ion mass spectroscopy (SIMS). The low temperature transport follows the one expected for a granular metal or insulator, depending on the interplay of intergranular and intragranular (tunneling) conductance. The metal-insulator transition takes place at a critical conductance gc. The granularity also influences significantly the superconducting properties by introducing the superconducting gap Δ in the grain and Josephson coupling J between superconducting grains. A peak in magnetoresistance is observed which can be explained by superconducting fluctuations and the granularity of the system. Additionally we studied the low temperature transport of boron-doped Si samples grown by gas immersion laser doping, some of which yielded a superconducting transition at very low temperatures. Furthermore, preliminary results on the LO-phonon-plasmon coupling are shown for the first time in aluminum-doped

  4. Tribological properties of undoped and boron-doped nanocrystalline diamond films

    International Nuclear Information System (INIS)

    Undoped and boron-doped nanocrystalline (NCD) diamond films were deposited on mirror polished Ti-6Al-4V substrates in a Microwave Plasma Assisted Chemical Vapor Deposition system. Sliding wear tests were conducted in ambient air with a nanotribometer. A systematic study of the tribological properties for both undoped and boron-doped NCD films were carried out. It was found for diamond/diamond sliding, coefficient of friction decreases with increasing normal loads. It was also found that the wear rate of boron-doped NCD films is about 10 times higher than that of undoped films. A wear rate of ∼ 5.2 x 10-9 mm3/Nm was found for undoped NCD films. This value is comparable to the best known value of that of polished polycrystalline diamond films. Although no surface deformation, film delamination or micro-cracking were observed for undoped films, boron-doped NCD film undergoes a critical failure at a normal stress of 2.2 GPa, above which surface deformation is evident. Combined with high hardness and modulus, tunable conductivity and improved open air thermal stability, boron-doped nanocrystalline diamond film has tremendous potentials for applications such as Atomic Force Microscope probes, Micro-Electro-Mechanical System devices and biomedical sensors

  5. Boron-doped MnO{sub 2}/carbon fiber composite electrode for supercapacitor

    Energy Technology Data Exchange (ETDEWEB)

    Chi, Hong Zhong, E-mail: hzchi@hdu.edu.cn [College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou 310018 (China); Zhu, Hongjie [College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou 310018 (China); Gao, Linhui [Center of Materials Engineering, Zhejiang Sci-Tech University, Hangzhou 310018 (China)

    2015-10-05

    Highlights: • Interstitial ion in MnO{sub 2} lattice. • Porous film composed by interlocking worm-like nanostructure. • Boron-doped birnessite-type MnO{sub 2}/carbon fiber composite electrode. • Enhanced capacitive properties through nonmetal element doping. - Abstract: The boron-doped MnO{sub 2}/carbon fiber composite electrode has been prepared via in situ redox reaction between potassium permanganate and carbon fibers in the presence of boric acid. The addition of boron as dopant results in the increase of growth-rate of MnO{sub 2} crystal and the formation of worm-like nanostructure. Based on the analysis of binding energy, element boron incorporates into the MnO{sub 2} lattice through interstitial mode. The doped electrode with porous framework is beneficial to pseudocapacitive reaction and surface charge storage, leading to higher specific capacitance and superior rate capability. After experienced 1000 cycles, the boron-doped MnO{sub 2} still retain a higher specific capacitance by about 80% of its initial value. The fall in capacitance is blamed to be the combination of the formation of soluble Mn{sup 2+} and the absence of active site on the outer surface.

  6. Multiple delta doping of single crystal cubic boron nitride films heteroepitaxially grown on (001)diamonds

    Energy Technology Data Exchange (ETDEWEB)

    Yin, H., E-mail: hyin@jlu.edu.cn [State Key Laboratory of Superhard Materials, Jilin University, Changchun 130012 (China); Ziemann, P. [Institute of Solid State Physics, Ulm University, D-89069 Ulm (Germany)

    2014-06-23

    Phase pure cubic boron nitride (c-BN) films have been epitaxially grown on (001) diamond substrates at 900 °C. The n-type doping of c-BN epitaxial films relies on the sequential growth of nominally undoped (p-) and Si doped (n-) layers with well-controlled thickness (down to several nanometer range) in the concept of multiple delta doping. The existence of nominally undoped c-BN overgrowth separates the Si doped layers, preventing Si dopant segregation that was observed for continuously doped epitaxial c-BN films. This strategy allows doping of c-BN films can be scaled up to multiple numbers of doped layers through atomic level control of the interface in the future electronic devices. Enhanced electronic transport properties with higher hall mobility (10{sup 2} cm{sup 2}/V s) have been demonstrated at room temperature as compared to the normally continuously Si doped c-BN films.

  7. Electronic properties of graphene nanoribbon doped by boron/nitrogen pair: a first-principles study

    Institute of Scientific and Technical Information of China (English)

    Xiao Jin; Yang Zhi-Xiong; Xie Wei-Tao; Xiao Li-Xin; Xu Hui; OuYang Fang-Ping

    2012-01-01

    By using the first-principles calculations,the electronic properties of graphene nanoribbon (GNR) doped by boron/nitrogen (B/N) bonded pair are investigated. It is found that B/N bonded pair tends to be doped at the edges of GNR and B/N pair doping in GNR is easier to carry out than single B doping and unbonded B/N co-doping in GNR.The electronic structure of GNR doped by B/N pair is very sensitive to doping site besides the ribbon width and chirality. Moreover,B/N pair doping can selectively adjust the energy gap of armchair GNR and can induce the semimetal-semiconductor transmission for zigzag GNR.This fact may lead to a possible method for energy band engineering of GNRs and benefit the design of graphene electronic device.

  8. Low temperature boron doping into crystalline silicon by boron-containing species generated in Cat-CVD apparatus

    International Nuclear Information System (INIS)

    We have discovered that phosphorus (P) atoms can be doped into crystalline silicon (c-Si) at temperatures below 350 °C or even at 80 °C by using species generated by catalytic cracking reaction of phosphine (PH3) molecules with heated tungsten (W) catalyzer in Cat-CVD apparatus. As further investigation, here, we study the feasibility of low temperature doping of boron (B) atoms into c-Si by using decomposed species generated similarly from diborane (B2H6) molecules. Dependency of properties of doped layers on catalyzer temperature (Tcat) and substrate temperature (Ts) is studied by both the Van der Pauw method based on the Hall-effect measurements and secondary ion mass spectroscopy (SIMS) for B doping in addition to P doping. It is found that, similarly to P doping, the surface of n-type c-Si is converted to p-type even at Ts = 80 °C for Tcat over 800 °C when c-Si is exposed to B2H6 cracked species for a few minutes, and that the heat of substrate over 300 °C is likely to help for B doping contrary to P doping

  9. Formation of Boron-Carbon Nanosheets and Bilayers in Boron-Doped Diamond: Origin of Metallicity and Superconductivity.

    Science.gov (United States)

    Polyakov, S N; Denisov, V N; Mavrin, B N; Kirichenko, A N; Kuznetsov, M S; Martyushov, S Yu; Terentiev, S A; Blank, V D

    2016-12-01

    The insufficient data on a structure of the boron-doped diamond (BDD) has frustrated efforts to fully understand the fascinating electronic properties of this material and how they evolve with doping. We have employed X-ray diffraction and Raman scattering for detailed study of the large-sized BDD single crystals. We demonstrate a formation of boron-carbon (B-C) nanosheets and bilayers in BDD with increasing boron concentration. An incorporation of two boron atoms in the diamond unit cell plays a key role for the B-C nanosheets and bilayer formation. Evidence for these B-C bilayers which are parallel to {111} planes is provided by the observation of high-order, super-lattice reflections in X-ray diffraction and Laue patterns. B-C nanosheets and bilayers minimize the strain energy and affect the electronic structure of BDD. A new shallow acceptor level associated with B-C nanosheets at ~37 meV and the spin-orbit splitting of the valence band of ~6 meV are observed in electronic Raman scattering. We identified that the superconducting transitions occur in the (111) BDD surfaces only. We believe that the origin of Mott and superconducting transitions is associated with the two-dimensional (2D) misfit layer structure of BDD. A model for the BDD crystal structure, based on X-ray and Raman data, is proposed and confirmed by density functional theoretical calculation. PMID:26754937

  10. Rectifying Properties of a Nitrogen/Boron-Doped Capped-Carbon-Nanotube-Based Molecular Junction

    Institute of Scientific and Technical Information of China (English)

    ZHAO Peng; LIU De-Sheng; ZHANG Ying; WANG Pei-Ji; ZHANG Zhong

    2011-01-01

    @@ Based on the non-equilibrium Green's function method and first-principles density functional theory calculations, we investigate the electronic transport properties of a nitrogen/boron-doped capped-single-walled carbonnanotube-based molecular junction.Obvious rectifying behavior is observed and it is strongly dependent on the doping site.The best rectifying performance can be carried out when the nitrogen/boron atom dopes at a carbon site in the second layer.Moreover, the rectifying performance can be further improved by adjusting the distance between the Cso nanotube caps.%Based on the non-equilibrium Green's function method and first-principles density functional theory calculations, we investigate the electronic transport properties of a nitrogen/boron-doped capped-single-walled carbon-nanotube-based molecular junction. Obvious rectifying behavior is observed and it is strongly dependent on the doping site. The best rectifying performance can be carried out when the nitrogen/boron atom dopes at a carbon site in the second layer. Moreover, the rectifying performance can be further improved by adjusting the distance between the C60 nanotube caps.

  11. Properties of boron-doped epitaxial diamond layers grown on (110) oriented single crystal substrates

    OpenAIRE

    Mortet, Vincent; Pernot, J.; Jomard, F.; Soltani, A; Remes, Zdenek; Barjon, Julien; D'Haen, J; Haenen, Ken

    2015-01-01

    Boron doped diamond layers have been grown on (110) single crystal diamond substrates with B/C ratios up to 20 ppm in the gas phase. The surface of the diamond layers observed by scanning electron microscopy consists of (100) and (113) micro-facets. Fourier Transform Photocurrent Spectroscopy indicates substitutional boron incorporation. Electrical properties were measured using Hall effect from 150 to 1000 K. Secondary ion mass spectrometry analyses are consistent with the high incorporation...

  12. Critical boron-doping levels for generation of dislocations in synthetic diamond

    Energy Technology Data Exchange (ETDEWEB)

    Alegre, M. P., E-mail: maripaz.alegre@uca.es; Araújo, D.; Pinero, J. C.; Lloret, F.; Villar, M. P. [Departamento de Ciencias de los Materiales e Ingeniería Metalúrgica y Química, Universidad de Cádiz, 11510 Puerto Real, Cádiz (Spain); Fiori, A.; Achatz, P.; Chicot, G.; Bustarret, E. [Université Grenoble Alpes, Institut NEEL, 25 av. des Martyrs, 38042 Grenoble (France); Jomard, F. [GEMaC, CNRS and Université de Versailles St Quentin, 45 Avenue des États-Unis, 78035 Versailles (France)

    2014-10-27

    Defects induced by boron doping in diamond layers were studied by transmission electron microscopy. The existence of a critical boron doping level above which defects are generated is reported. This level is found to be dependent on the CH{sub 4}/H{sub 2} molar ratios and on growth directions. The critical boron concentration lied in the 6.5–17.0 × 10{sup 20}at/cm{sup 3} range in the 〈111〉 direction and at 3.2 × 10{sup 21 }at/cm{sup 3} for the 〈001〉 one. Strain related effects induced by the doping are shown not to be responsible. From the location of dislocations and their Burger vectors, a model is proposed, together with their generation mechanism.

  13. Synthesis and characterization of p-type boron-doped IIb diamond large single crystals

    Institute of Scientific and Technical Information of China (English)

    Li Shang-Sheng; Ma Hong-An; Li Xiao-Lei; Su Tai-Chao; Huang Guo-Feng; Li Yong; Jia Xiao-Peng

    2011-01-01

    High-quality p-type boron-doped II0b diamond large single crystals are successfully synthesized by the temperature gradient method in a china-type cubic anvil high-pressure apparatus at about 5.5 GPa and 1600 K. The morphologies and surface textures of the synthetic diamond crystals with different boron additive quantities are characterized by using an optical microscope and a scanning electron microscope respectively. The impurities of nitrogen and boron in diamonds are detected by micro Fourier transform infrared technique. The electrical properties including resistivities, Hall coefficients, Hall mobilities and carrier densities of the synthesized samples are measured by a four-point probe and the Hall effect method. The results show that large p-type boron-doped diamond single crystals with few nitrogen impurities have been synthesized. With the increase of quantity of additive boron, some high-index crystal faces such as {113} gradually disappear, and some stripes and triangle pits occur on the crystal surface. This work is helpful for the further research and application of boron-doped semiconductor diamond.

  14. Localization of metallicity and magnetic properties of graphene and of graphene nanoribbons doped with boron clusters

    Science.gov (United States)

    Özdoğan, Cem; Kunstmann, Jens; Quandt, Alexander

    2014-06-01

    As a possible way of modifying the intrinsic properties of graphene, we study the doping of graphene by embedded boron clusters with density functional theory. Cluster doping is technologically relevant as the cluster implantation technique can be readily applied to graphene. We find that B? clusters embedded into graphene and graphene nanoribbons are structurally stable and locally metallize the system. This is done both by the reduction of the Fermi energy and by the introduction of boron states near the Fermi level. A linear chain of boron clusters forms a metallic "wire" inside the graphene matrix. In a zigzag edge graphene nanoribbon, the cluster-related states tend to hybridize with the edge and bulk states. The magnetism in boron-doped graphene systems is generally very weak. The presence of boron clusters weakens the edge magnetism in zigzag edge graphene nanoribbon, rather than making the system appropriate for spintronics. Thus, the doping of graphene with the cluster implantation technique might be a viable technique to locally metallize graphene without destroying its attractive bulk properties.

  15. Note: Novel diamond anvil cell for electrical measurements using boron-doped metallic diamond electrodes.

    Science.gov (United States)

    Matsumoto, R; Sasama, Y; Fujioka, M; Irifune, T; Tanaka, M; Yamaguchi, T; Takeya, H; Takano, Y

    2016-07-01

    A novel diamond anvil cell suitable for electrical transport measurements under high pressure has been developed. A boron-doped metallic diamond film was deposited as an electrode on a nano-polycrystalline diamond anvil using a microwave plasma-assisted chemical vapor deposition technique combined with electron beam lithography. The maximum pressure that can be achieved by this assembly is above 30 GPa. We report electrical transport measurements of Pb up to 8 GPa. The boron-doped metallic diamond electrodes showed no signs of degradation after repeated compression. PMID:27475610

  16. Femtosecond Laser Crystallization of Boron-doped Amorphous Hydrogenated Silicon Films

    Directory of Open Access Journals (Sweden)

    P.D. Rybalko

    2016-10-01

    Full Text Available Crystallization of amorphous hydrogenated silicon films with femtosecond laser pulses is one of the promising ways to produce nanocrystalline silicon for photovoltaics. The structure of laser treated films is the most important factor determining materials' electric and photoelectric properties. In this work we investigated the effect of femtosecond laser irradiation of boron doped amorphous hydrogenated silicon films with different fluences on crystalline volume fraction and electrical properties of this material. A sharp increase of conductivity and essential decrease of activation energy of conductivity temperature dependences accompany the crystallization process. The results obtained are explained by increase of boron doping efficiency in crystalline phase of modified silicon film.

  17. CVD Delta-Doped Boron Surface Layers for Ultra-Shallow Junction Formation

    OpenAIRE

    Sarubbi, F.; Nanver, L.K.; Scholtes, T.L.M.

    2006-01-01

    A new doping technique is presented that uses a pure boron atmospheric/low-pressure chemical vapor deposition (AP/LPCVD) in a commercially available epitaxial reactor to form less than 2-nm-thick δ-doped boron-silicide (BxSi) layers on the silicon surface. For long exposure B segregates at the surface to form a very slow growing amorphous layer of pure B (α-B). The electrical properties of the as-deposited α- B/BxSi stack have been studied by fabricating and measuring diodes where the B depos...

  18. Detecting CO, NO and NO2 gases by Boron-doped graphene nanoribbon molecular devices

    Science.gov (United States)

    Xie, Zhen; Zuo, Xi; Zhang, Guang-Ping; Li, Zong-Liang; Wang, Chuan-Kui

    2016-07-01

    Combining nonequilibrium Green's function method and density functional theory, an azulene-like dipole molecule sandwiched between two graphene nanoribbon (GNR) electrodes are explored to gas sensors. Both the pristine zigzag edged GNR and Boron-doped armchair-edged GNR are considered in this study. It shows that certain specific toxic molecules CO, NO and NO2 would adsorb on the doped Boron atoms of the GNR, resulting in a dramatic change in the current-voltage profile. Changes in the subbands of electrodes, induced by gas adsorption, are responsible for the variation of current. The devices are thus demonstrated to be sensitive nanosensors for these toxic gases.

  19. Boron-doped MnTe semiconductor-sensitized ZnO solar cells

    Indian Academy of Sciences (India)

    Auttasit Tubtimtae; Suwanna Sheangliw; Kritsada Hongsith; Supab Choopun

    2014-10-01

    We studied the photovoltaic performance of boron-doped MnTe semiconductor-sensitized solar cells (B-doped MnTe SSCs). The B-doped MnTe semiconductor was grown on ZnO using two stages of the successive ionic layer adsorption and reaction (SILAR) technique. The two phases of B-doped semiconductor nanoparticles (NPs), i.e. MnTe and MnTe2 were observed with a diameter range of approximately 15–30 nm. The result of the energy conversion efficiency of the sample with boron doping was superior compared to that of an undoped sample, due to the substantial change in the short-circuit current density and the open-circuit voltage. In addition, plots of ( ℎ )2 vs ℎ with band gaps of 1.30 and 1.27 eV were determined for the undoped and B-doped MnTe NPs, respectively. It can be noted that the boron doping effects with the change in the band gap and lead to an improvement in the crystalline quality and also intimate contact between the larger sizes of MnTe NPs. Hence, a noticeably improved photovoltaic performance resulted. However, this kind of semiconductor sensitizer can be further extended by experiments on yielding a higher power conversion efficiency and greater stability of the device.

  20. First-principles study of palladium atom adsorption on the boron- or nitrogen-doped carbon nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Chen Guoxiang [College of Physics and Information Technology, Shaanxi Normal University, Xi' an 710062, Shaanxi (China); School of Science, Xi' an Shiyou University, Xi' an 710065, Shaanxi (China); Zhang Jianmin, E-mail: jianm_zhang@yahoo.co [College of Physics and Information Technology, Shaanxi Normal University, Xi' an 710062, Shaanxi (China); Wang Doudou [Institute of Telecommunication Engineering of the Air Force Engineering University (AFEU1), Xi' an 710077, Shaanxi (China); Xu Kewei [State Key Laboratory for Mechanical Behavior of Materials, Xi' an Jiaotong University, Xi' an 710049, Shaanxi (China)

    2009-11-15

    We have performed first-principles calculation to investigate the adsorption of a single palladium atom on the surface of the pristine and boron- or nitrogen-doped carbon nanotubes (CNTs). The results show that for the adsorption of a single palladium atom on the pristine CNT surface, the most stable site is Bridge1 site above the axial carbon-carbon bond. Either boron- or nitrogen-doped CNTs can assist palladium surface adsorption, but the detailed mechanisms are different. The enhanced palladium adsorption on boron-doped CNT is attributed to the palladium d orbital strongly hybridized with both boron p orbital and carbon p orbital. The enhancement in palladium adsorption on nitrogen-doped CNT results from activating the nitrogen-neighboring carbon atoms due to the large electron affinity of nitrogen. Furthermore, the axial bond is preferred over the zigzag bond for a palladium atom adsorbed on the surface of all three types of CNTs. The most energetically favorable site for a palladium atom adsorbed on three types of CNTs is above the axial boron-carbon bond in boron-doped CNT. The enhancement in palladium adsorption is more significant for the boron-doped CNT than it is for nitrogen-doped CNT with a similar configuration. So we conclude that accordingly, the preferred adsorption site is determined by the competition between the electron affinity of doped and adsorbed atoms and preferred degree of the axial bond over the zigzag bond.

  1. New Pathways and Metrics for Enhanced, Reversible Hydrogen Storage in Boron-Doped Carbon Nanospaces

    Energy Technology Data Exchange (ETDEWEB)

    Pfeifer, Peter [University of Missouri; Wexler, Carlos [University of Missouri; Hawthorne, M. Frederick [University of Missouri; Lee, Mark W. [University of Missouri; Jalistegi, Satish S. [University of Missouri

    2014-08-14

    This project, since its start in 2007—entitled “Networks of boron-doped carbon nanopores for low-pressure reversible hydrogen storage” (2007-10) and “New pathways and metrics for enhanced, reversible hydrogen storage in boron-doped carbon nanospaces” (2010-13)—is in support of the DOE's National Hydrogen Storage Project, as part of the DOE Hydrogen and Fuel Cells Program’s comprehensive efforts to enable the widespread commercialization of hydrogen and fuel cell technologies in diverse sectors of the economy. Hydrogen storage is widely recognized as a critical enabling technology for the successful commercialization and market acceptance of hydrogen powered vehicles. Storing sufficient hydrogen on board a wide range of vehicle platforms, at energy densities comparable to gasoline, without compromising passenger or cargo space, remains an outstanding technical challenge. Of the main three thrust areas in 2007—metal hydrides, chemical hydrogen storage, and sorption-based hydrogen storage—sorption-based storage, i.e., storage of molecular hydrogen by adsorption on high-surface-area materials (carbons, metal-organic frameworks, and other porous organic networks), has emerged as the most promising path toward achieving the 2017 DOE storage targets of 0.055 kg H2/kg system (“5.5 wt%”) and 0.040 kg H2/liter system. The objective of the project is to develop high-surface-area carbon materials that are boron-doped by incorporation of boron into the carbon lattice at the outset, i.e., during the synthesis of the material. The rationale for boron-doping is the prediction that boron atoms in carbon will raise the binding energy of hydro- gen from 4-5 kJ/mol on the undoped surface to 10-14 kJ/mol on a doped surface, and accordingly the hydro- gen storage capacity of the material. The mechanism for the increase in binding energy is electron donation from H2 to electron-deficient B atoms, in the form of sp2 boron-carbon bonds. Our team is proud to have

  2. Resonance of graphene nanoribbons doped with nitrogen and boron: a molecular dynamics study

    Directory of Open Access Journals (Sweden)

    Ye Wei

    2014-05-01

    Full Text Available Based on its enticing properties, graphene has been envisioned with applications in the area of electronics, photonics, sensors, bio-applications and others. To facilitate various applications, doping has been frequently used to manipulate the properties of graphene. Despite a number of studies conducted on doped graphene regarding its electrical and chemical properties, the impact of doping on the mechanical properties of graphene has been rarely discussed. A systematic study of the vibrational properties of graphene doped with nitrogen and boron is performed by means of a molecular dynamics simulation. The influence from different density or species of dopants has been assessed. It is found that the impacts on the quality factor, Q, resulting from different densities of dopants vary greatly, while the influence on the resonance frequency is insignificant. The reduction of the resonance frequency caused by doping with boron only is larger than the reduction caused by doping with both boron and nitrogen. This study gives a fundamental understanding of the resonance of graphene with different dopants, which may benefit their application as resonators.

  3. STURCTURAL CHARACTERISTICS AND QUANTUM CHEMISTRY CALCULATION OF Al-DOPED BORON CARBIDES

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    Structural characteristics, chemical bonds and thermoelectric properties of Al-doped boron carbides are studied through calculations of various structural unit models by using a self-consistent-field discrete variation Xα method. The calculations show that Al atom doped in boron carbide is in preference to substituting B or C atoms on the end of boron carbide chain, and then may occupy interstitial sites, but it is difficult for Al to substitute B or C atom in the centers of the chain or in the icosahedra. A representative structural unit containing an Al atom is [C-B-Al]ε+-[B11C]ε-, while the structural unit without Al is [C-B-B(C)]ε--[B11C]ε+, and the coexistence of these two different structural units makes the electrical conductivity increased. As the covalent bond of Al-B or Al-C is weaker than that of B-B or B-C, the thermal conductivity decreases when Al is added into boron carbides. With the electrical conductivity increasing and the thermal conductivity decreases, Al doping has significant effect on thermoelectric properties of boron carbides.

  4. Biophotonic low-coherence sensors with boron-doped diamond thin layer

    Science.gov (United States)

    Milewska, D.; Karpienko, K.; Sobaszek, M.; Jedrzejewska-Szczerska, M.

    2016-03-01

    Low-coherence sensors using Fabry-Perot interferometers are finding new applications in biophotonic sensing, especially due to the rapid technological advances in the development of new materials. In this paper we discuss the possibility of using boron-doped nanodiamond layers to protect mirror in a Fabry-Perot interferometer. A low-coherence sensor using Fabry-Perot interferometer with a boron-doped nanodiamond (B-NCD) thin protective layer has been developed. B-NCD layers with different boron doping level were investigated. The boron level, expressed as the boron to carbon (/[C]) ratio in the gas phase, was: 0, 2000, 5000 or 10000 ppm. B-NCD layers were grown by chemical vapor deposition (CVD). The sensing Fabry-Perot interferometer, working in the reflective mode, was connected to the source and to the optical processor by single-mode fibers. Superluminescent diodes with Gaussian spectral density were used as sources, while an optical spectrum analyzer was used as an optical processor. The design of the sensing interferometer was optimized to attain the maximum interference contrast. The experiment has shown that B-NCD thin layers can be successfully used in biophotonic sensors.

  5. Mg-doping experiment and electrical transport measurement of boron nanobelts

    International Nuclear Information System (INIS)

    We measured electrical conductance of single crystalline boron nanobelts having α-tetragonal crystalline structure. The doping experiment of Mg was carried out by vapor diffusion method. The pure boron nanobelt is a p-type semiconductor and its electrical conductivity was estimated to be on the order of 10-3 (Ω cm)-1 at room temperature. The carrier mobility of pure boron nanobelt was measured to be on the order of 10-3 (cm2 Vs-1) at room temperature and has an activation energy of ∼0.19 eV. The Mg-doped boron nanobelts have the same α-tetragonal crystalline structure as the pristine nanobelts. After Mg vapor diffusion, the nanobelts were still semiconductor, while the electrical conductance increased by a factor of 100-500. Transition to metal or superconductor by doping was not observed. - Graphical abstract: SEM micrographs of boron nanobelt after Ni/Au electrode fabrication by electron beam lithography. Display Omitted

  6. Biocompatibility of nanostructured boron doped diamond for the attachment and proliferation of human neural stem cells

    Science.gov (United States)

    Taylor, Alice C.; Vagaska, Barbora; Edgington, Robert; Hébert, Clément; Ferretti, Patrizia; Bergonzo, Philippe; Jackman, Richard B.

    2015-12-01

    Objective. We quantitatively investigate the biocompatibility of chemical vapour deposited (CVD) nanocrystalline diamond (NCD) after the inclusion of boron, with and without nanostructuring. The nanostructuring method involves a novel approach of growing NCD over carbon nanotubes (CNTs) that act as a 3D scaffold. This nanostructuring of BNCD leads to a material with increased capacitance, and this along with wide electrochemical window makes BNCD an ideal material for neural interface applications, and thus it is essential that their biocompatibility is investigated. Approach. Biocompatibility was assessed by observing the interaction of human neural stem cells (hNSCs) with a variety of NCD substrates including un-doped ones, and NCD doped with boron, which are both planar, and nanostructured. hNSCs were chosen due to their sensitivity, and various methods including cell population and confluency were used to quantify biocompatibility. Main results. Boron inclusion into NCD film was shown to have no observable effect on hNSC attachment, proliferation and viability. Furthermore, the biocompatibility of nanostructured boron-doped NCD is increased upon nanostructuring, potentially due to the increased surface area. Significance. Diamond is an attractive material for supporting the attachment and development of cells as it can show exceptional biocompatibility. When boron is used as a dopant within diamond it becomes a p-type semiconductor, and at high concentrations the diamond becomes quasi-metallic, offering the prospect of a direct electrical device-cell interfacing system.

  7. Tuning the electronic properties of armchair carbon nanoribbons by a selective boron doping

    International Nuclear Information System (INIS)

    Armchair carbon nanoribbons (ACNRs) substitutionally doped with boron atoms are investigated in the framework of first-principles density functional theory. Different boron-boron arrangements and concentrations are considered in order to simulate possible aggregation patterns, their structural stability and electronic behavior are determined as a function of ribbon size. In agreement with previous studies, our results show that the dopant atoms have in general a preference for edge sites, but specific effects appear as a function of concentration that importantly modify the properties of the ribbons compared to the pristine case. Interesting tendencies are discovered as a function of dopant concentration that significantly affect the electronic properties of the ribbons. We have found that BC3 island formation and edge doping are the most important factors for the structural stabilization of the ribbons with high boron concentration (>7%) whereas for the cases of low boron concentrations (3 island patterns give rise to highly localized B states on top of the Fermi level, resulting in semiconducting behavior. On the other hand, when the average distance between the B atoms increases beyond island stoichiometry, the localization of their states is reduced and the ribbons may become metallic due to a band crossing caused by the lowering of the Fermi level resulting from the positive charge doping. Thus, tuning the dopant interaction would be an appropriate way to tailor the electronic properties of the ribbons in a convenient manner in view of potential technological applications.

  8. Delta-doping of boron atoms by photoexcited chemical vapor deposition

    International Nuclear Information System (INIS)

    Boron delta-doped structures in Si crystals were fabricated by means of photoexcited chemical vapor deposition (CVD). Core electronic excitation with high-energy photons ranging from vacuum ultraviolet to soft x rays decomposes B2H6 molecules into fragments. Combined with in situ monitoring by spectroscopic ellipsometry, limited number of boron hydrides can be delivered onto a Si(100) surface by using the incubation period before the formation of a solid boron film. The boron-covered surface is subsequently embedded in a Si cap layer by Si2H6 photo-excited CVD. The crystallinity of the Si cap layer depended on its thickness and the substrate temperature. The evaluation of the boron depth profile by secondary ion mass spectroscopy revealed that boron atoms were confined within the delta-doped layer at a concentration of 2.5 x 1020 cm-3 with a full width at half maximum of less than 9 nm, while the epitaxial growth of a 130-nm-thick Si cap layer was sustained at 420 deg. C.

  9. Growth and electrical characterisation of {delta}-doped boron layers on (111) diamond surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Edgington, Robert; Jackman, Richard B. [London Centre for Nanotechnology, and Department of Electronic and Electrical Engineering, University College London, 17-19 Gordon Street, London, WC1H 0AH (United Kingdom); Sato, Syunsuke; Ishiyama, Yuichiro; Kawarada, Hiroshi [Department of Electronic and Photonic Systems, Waseda University, Okubo 3-4-1, Shinjuku, Tokyo 169-8555 (Japan); Morris, Richard [Advanced SIMS Projects, Department of Physics, University of Warwick, Coventry CV4 7AL (United Kingdom)

    2012-02-01

    A plasma enhanced chemical vapor deposition protocol for the growth of {delta}-doping of boron in diamond is presented, using the (111) diamond plane as a substrate for diamond growth. AC Hall effect measurements have been performed on oxygen terminated {delta}-layers and desirable sheet carrier densities ({approx}10{sup 13} cm{sup -2}) for field-effect transistor application are reported with mobilities in excess of what would expected for equivalent but thicker heavily boron-doped diamond films. Temperature-dependent impedance spectroscopy and secondary ion mass spectroscopy measurements show that the grown layers have metallic-like electrical properties with high cut-off frequencies and low thermal impedance activation energies with estimated boron concentrations of approximately 10{sup 20} cm{sup -3}.

  10. Thermal shock resistance of thick boron-doped diamond under extreme heat loads

    NARCIS (Netherlands)

    De Temmerman, G.; Dodson, J.; Linke, J.; Lisgo, S.; Pintsuk, G.; Porro, S.; Scarsbrook, G.

    2011-01-01

    Thick free-standing boron-doped diamonds were prepared by microwave plasma assisted chemical vapour deposition. Samples with a final thickness close to 5 mm and with lateral dimensions 25 x 25 mm were produced. The thermal shock resistance of the material was tested by exposure in the JUDITH electro

  11. Boron doping compensation of hydrogenated amorphous and polymorphous germanium thin films for infrared detection applications

    Energy Technology Data Exchange (ETDEWEB)

    Moreno, M., E-mail: mmoreno@inaoep.mx [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico); Delgadillo, N. [Universidad Autónoma de Tlaxcala, Av. Universidad No. 1, Z. P. 90006 Tlaxcala (Mexico); Torres, A. [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico); Ambrosio, R. [Technology and Engineering Institute, Ciudad Juarez University UACJ, Av. Del Charro 450N, Z. P. 32310 Chihuahua (Mexico); Rosales, P.; Kosarev, A.; Reyes-Betanzo, C.; Hidalga-Wade, J. de la; Zuniga, C.; Calleja, W. [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico)

    2013-12-02

    In this work we have studied boron doping of hydrogenated amorphous germanium a-Ge:H and polymorphous germanium (pm-Ge:H) in low regimes, in order to compensate the material from n-type (due to oxygen contamination that commonly occurs during plasma deposition) to intrinsic, and in this manner improve the properties that are important for infrared (IR) detection, as activation energy (E{sub a}) and temperature coefficient of resistance (TCR). Electrical, structural and optical characterization was performed on the films produced. Measurements of the temperature dependence of conductivity, room temperature conductivity (σ{sub RT}), E{sub a} and current–voltage characteristics under IR radiation were performed in the compensated a-Ge:H and pm-Ge:H films. Our results demonstrate that, effectively, the values of E{sub a}, TCR and IR detection are improved on the a-Ge:H/pm-Ge:H films, using boron doping in low regimes, which results of interest for infrared detectors. - Highlights: • We reported boron doping compensation of amorphous and polymorphous germanium. • The films were deposited by plasma enhanced chemical vapor deposition. • The aim is to use the films as thermo-sensing elements in un-cooled microbolometers. • Those films have advantages over boron doped a-Si:H used in commercial detectors.

  12. Voltammetric determination of wedelolactone, an anti-HIV herbal drug, at boron-doped diamond electrode

    Indian Academy of Sciences (India)

    Sachin Saxena; Ratnanjali Shrivastava; Soami P Satsangee

    2015-05-01

    Boron-doped diamond electrode has been utilized for the study of electrochemical behaviour of an anti-HIV herbal drug wedelolactone in Britton-Robinson buffer (pH-2.5) by square-wave and cyclic voltammetry techniques. The response characteristics of cyclic voltammetry and square wave voltammetry showed a remarkable increase in the anodic peak current and electrochemical impedance spectroscopy revealed a lowering in charge transfer resistance at the boron-doped diamond electrode as compared to the glassy carbon electrode that can be attributed to the higher sensitivity of boron-doped diamond sensor. Cyclic voltammetry at the boron-doped diamond surface revealed the oxidation of wedelolactone with two oxidation peaks (P1 and P2) with Ep1 = 0.4V and Ep2 =1.00 V with scan rate varying from 10 - 220 mV/s and exhibits diffusion-controlled process. Based on the electrochemical measurements, a probable oxidation mechanism has been deduced and the electrode dynamics parameters have been evaluated. The effect of concentration on the peak currents of wedelolactone was found to have a linear relationship within the concentration range of 50–700 ng/mL. The LOD and LOQ were found to be 43.87 and 132.93 ng/mL respectively. The applicability of the proposed method was further scrutinized by the successful determination of wedelolactone in real plant samples.

  13. Platinum–boron doped graphene intercalated by carbon black for cathode catalyst in proton exchange membrane fuel cell

    International Nuclear Information System (INIS)

    In order to enhance the electrochemical properties, especially durability and cell performance in proton exchange membrane fuel cell, electron deficient boron is doped into graphene, followed by deposition of Pt nanoparticles. Successful synthesis of Pt-boron doped graphene (Pt–B–Gr) by pyrolytic process is confirmed by X-ray diffraction, X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, Raman spectroscopy and Transmission electron microscopy analyses. Pt–B–Gr is intercalated by different amount of CB (carbon black) based on Pt–B–Gr/CBx (x = 0.0, 0.2, 0.3, 0.4) and applied to cathode in proton exchange membrane fuel cell. The ECSA (electrochemical active surface area) is increased with CB content up to 30 wt.% of Pt–B–Gr from 21.4 to 33.6 m2 g−1 beyond which it is rather slightly decreased to 29.6 m2 g−1. The ADT (accelerated durability test) is conducted where the ECSA is compared at every 400 cycles up to 1200 cycles for durability. The result exhibits that boron doping into graphene significantly enhances the durability. It might be attributed to more tight binding between Pt and B due to the electron transfer from graphene to boron. The cell performance is enhanced and it is attributed to the combined effect of B-doping and intercalation. - Highlights: • Graphene was successfully doped with boron using pyrolytic process. • Pt nanoparticles were deposited onto boron-doped graphene. • Pt-boron doped graphene was intercalated by carbon black to prevent restacking. • Boron doping significantly enhanced the durability. • The combined effect of boron doping and intercalation enhanced the cell performance

  14. Cat-doping: Novel method for phosphorus and boron shallow doping in crystalline silicon at 80 °C

    Energy Technology Data Exchange (ETDEWEB)

    Matsumura, Hideki; Hayakawa, Taro; Ohta, Tatsunori; Nakashima, Yuki; Miyamoto, Motoharu; Thi, Trinh Cham; Koyama, Koichi; Ohdaira, Keisuke [Japan Advanced Institute of Science and Technology (JAIST), Asahidai, Nomi-shi, Ishikawa-ken 923-1292 (Japan)

    2014-09-21

    Phosphorus (P) or boron (B) atoms can be doped at temperatures as low as 80 to 350 °C, when crystalline silicon (c-Si) is exposed only for a few minutes to species generated by catalytic cracking reaction of phosphine (PH₃) or diborane (B₂H₆) with heated tungsten (W) catalyzer. This paper is to investigate systematically this novel doping method, “Cat-doping”, in detail. The electrical properties of P or B doped layers are studied by the Van der Pauw method based on the Hall effects measurement. The profiles of P or B atoms in c-Si are observed by secondary ion mass spectrometry mainly from back side of samples to eliminate knock-on effects. It is confirmed that the surface of p-type c-Si is converted to n-type by P Cat-doping at 80 °C, and similarly, that of n-type c-Si is to p-type by B Cat-doping. The doping depth is as shallow as 5 nm or less and the electrically activated doping concentration is 10¹⁸ to 10¹⁹cm⁻³ for both P and B doping. It is also found that the surface potential of c-Si is controlled by the shallow Cat-doping and that the surface recombination velocity of minority carriers in c-Si can be enormously lowered by this potential control.

  15. Boron diffusion into nitrogen doped silicon films for P{sup +} polysilicon gate structures

    Energy Technology Data Exchange (ETDEWEB)

    Mansour, Farida; Mahamdi, Ramdane; Jalabert, Laurent; Temple-Boyer, Pierre

    2003-06-23

    This paper deals with the study of the boron diffusion in nitrogen doped silicon (NIDOS) deposited from disilane Si{sub 2}H{sub 6} and ammonia NH{sub 3} for the development of P{sup +} polysilicon gate metal oxide semiconductor (MOS) devices. NIDOS films with varied nitrogen content have been boron implanted, then annealed and finally analysed by secondary ion mass spectroscopy (SIMS). In order to simulate the experimental SIMS of boron concentration profiles in the NIDOS films, a model adapted to the particular conditions of the samples elaboration, i.e. the very high boron concentration and the nitrogen content, has been established. The boron diffusion reduction in NIDOS films with increasing nitrogen rates has been evidenced by the profiles as well as by the obtained diffusion coefficients, which shows that the nitrogen incorporation reduces the boron diffusion. This has been confirmed by capacitance-voltage (C-V) measurements performed on MOS capacitors: the higher the nitrogen content, the lower the flat-band voltage. Finally, these results demonstrate that the improvement of the gate oxide quality occurs with the suppression of the boron penetration.

  16. Boosting the Boron Dopant Level in Monolayer Doping by Carboranes.

    Science.gov (United States)

    Ye, Liang; González-Campo, Arántzazu; Núñez, Rosario; de Jong, Michel P; Kudernac, Tibor; van der Wiel, Wilfred G; Huskens, Jurriaan

    2015-12-16

    Monolayer doping (MLD) presents an alternative method to achieve silicon doping without causing crystal damage, and it has the capability of ultrashallow doping and the doping of nonplanar surfaces. MLD utilizes dopant-containing alkene molecules that form a monolayer on the silicon surface using the well-established hydrosilylation process. Here, we demonstrate that MLD can be extended to high doping levels by designing alkenes with a high content of dopant atoms. Concretely, carborane derivatives, which have 10 B atoms per molecule, were functionalized with an alkene group. MLD using a monolayer of such a derivative yielded up to ten times higher doping levels, as measured by X-ray photoelectron spectroscopy and dynamic secondary mass spectroscopy, compared to an alkene with a single B atom. Sheet resistance measurements showed comparably increased conductivities of the Si substrates. Thermal budget analyses indicate that the doping level can be further optimized by changing the annealing conditions. PMID:26595856

  17. Electronic structure of boron doped diamond: An x-ray spectroscopic study

    OpenAIRE

    Glans, P.-A.; Learmonth, T.; Smith, K. E.; Ferro, S.; Battisti, A.; Mattesini, Maurizio; Ahuja, R.; Guo, J. -H.

    2013-01-01

    The valence and conduction band electronic structure of boron-doped diamond has been measured using soft x-ray emission and absorption spectroscopy. The experimental results reveal p-type doping in the diamond film through the appearance of states in the band-gap. Structure distortion was observed around the doping center, while the long range order of the diamond structure remains. A chemically shifted C 1s level explains why one of the absorption features seems to appear below the valence b...

  18. Structural Features of Boron-Doped Si(113) Surfaces Simulated by ab initio Calculations

    Institute of Scientific and Technical Information of China (English)

    LIAO Long-Zhong; LIU Zheng-Hui; ZHANG Zhao-Hui

    2008-01-01

    Based on ab initio calculations, boron-doped Si(113) surfaces have been simulated and atomic structures of the surfaces have been proposed. It has been determined that surface features of empty and filled states that are separately localized at pentamers and adatoms indicates a low surface density of B atoms, while it is attributed to heavy doping of B atoms at the second layer that pentamers and adatoms are both present in an image of scanning tunnelling microscopy. B doping at the second layer should be balanced by adsorbed B or Si atoms beside the adatoms and inserted B interstitials below the adatoms.

  19. Adsorption of sugars on Al- and Ga-doped boron nitride surfaces: A computational study

    Science.gov (United States)

    Darwish, Ahmed A.; Fadlallah, Mohamed M.; Badawi, Ashraf; Maarouf, Ahmed A.

    2016-07-01

    Molecular adsorption on surfaces is a key element for many applications, including sensing and catalysis. Non-invasive sugar sensing has been an active area of research due to its importance to diabetes care. The adsorption of sugars on a template surface study is at the heart of matter. Here, we study doped hexagonal boron nitride sheets (h-BNNs) as adsorbing and sensing template for glucose and glucosamine. Using first principles calculations, we find that the adsorption of glucose and glucosamine on h-BNNs is significantly enhanced by the substitutional doping of the sheet with Al and Ga. Including long range van der Waals corrections gives adsorption energies of about 2 eV. In addition to the charge transfer occurring between glucose and the Al/Ga-doped BN sheets, the adsorption alters the size of the band gap, allowing for optical detection of adsorption. We also find that Al-doped boron nitride sheet is better than Ga-doped boron nitride sheet to enhance the adsorption energy of glucose and glucosamine. The results of our work can be potentially utilized when designing support templates for glucose and glucosamine.

  20. Transport properties of boron-doped single-walled silicon carbide nanotubes

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Y.T. [Key laboratory of Ministry of Education for Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi' an 710071 (China); Ding, R.X., E-mail: rx_ding@163.co [Key laboratory of Ministry of Education for Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi' an 710071 (China); Song, J.X. [Key laboratory of Ministry of Education for Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi' an 710071 (China); School of Electronic Engineering, Xi' an Shiyou University, Xi' an 710075 (China)

    2011-01-15

    The doped boron (B) atom in silicon carbide nanotube (SiCNT) can substitute carbon or silicon atom, forming two different structures. The transport properties of both B-doped SiCNT structures are investigated by the method combined non-equilibrium Green's function with density functional theory (DFT). As the bias ranging from 0.8 to 1.0 V, the negative differential resistance (NDR) effect occurs, which is derived from the great difficulty for electrons tunneling from one electrode to another with the increasing of localization of molecular orbital. The high similar transport properties of both B-doped SiCNT indicate that boron is a suitable impurity for fabricating nano-scale SiCNT electronic devices.

  1. Thermal Diffusion Boron Doping of Single-Crystal Diamond

    OpenAIRE

    Seo, Jung-Hun; Wu, Henry; Mikael, Solomon; Mi, Hongyi; Blanchard, James P.; Venkataramanan, Giri; Zhou, Weidong; Gong, Sarah; Morgan, Dane; Ma, Zhenqiang

    2016-01-01

    With the best overall electronic and thermal properties, single crystal diamond (SCD) is the extreme wide bandgap material that is expected to revolutionize power electronics and radio-frequency electronics in the future. However, turning SCD into useful semiconductors requires overcoming doping challenges, as conventional substitutional doping techniques, such as thermal diffusion and ion implantation, are not easily applicable to SCD. Here we report a simple and easily accessible doping str...

  2. Tuning the electronic properties of armchair carbon nanoribbons by a selective boron doping

    Energy Technology Data Exchange (ETDEWEB)

    Navarro-Santos, P; Ricardo-Chavez, J L; Lopez-Sandoval, R [Instituto Potosino de Investigacion Cientifica y Tecnologica, Camino a la presa San Jose 2055, San Luis Potosi 78216 (Mexico); Reyes-Reyes, M [Instituto de Investigacion en Comunicacion Optica, Universidad Autonoma de San Luis Potosi, Alvaro Obregon 64, San Luis Potosi 78000 (Mexico); Rivera, J L, E-mail: sandov@ipicyt.edu.m [Facultad de Ingenieria Quimica, Universidad Michoacana de San Nicolas de Hidalgo, Santiago Tapia 403, Morelia, Michoacan, 58000 (Mexico)

    2010-12-22

    Armchair carbon nanoribbons (ACNRs) substitutionally doped with boron atoms are investigated in the framework of first-principles density functional theory. Different boron-boron arrangements and concentrations are considered in order to simulate possible aggregation patterns, their structural stability and electronic behavior are determined as a function of ribbon size. In agreement with previous studies, our results show that the dopant atoms have in general a preference for edge sites, but specific effects appear as a function of concentration that importantly modify the properties of the ribbons compared to the pristine case. Interesting tendencies are discovered as a function of dopant concentration that significantly affect the electronic properties of the ribbons. We have found that BC{sub 3} island formation and edge doping are the most important factors for the structural stabilization of the ribbons with high boron concentration (>7%) whereas for the cases of low boron concentrations (<5%) the structural stabilities are similar. For all the doped cases, we have found that the BC{sub 3} island patterns give rise to highly localized B states on top of the Fermi level, resulting in semiconducting behavior. On the other hand, when the average distance between the B atoms increases beyond island stoichiometry, the localization of their states is reduced and the ribbons may become metallic due to a band crossing caused by the lowering of the Fermi level resulting from the positive charge doping. Thus, tuning the dopant interaction would be an appropriate way to tailor the electronic properties of the ribbons in a convenient manner in view of potential technological applications.

  3. Synthesis of Boron-doped Diamond/Porous Ti Composite Materials——Effect of Carbon Concentration

    Institute of Scientific and Technical Information of China (English)

    MA Ming; CHANG Ming; LI Xiaowei

    2012-01-01

    Highly boron-doped diamond films were deposited on porous titanium substrates by hot filament chemical vapor deposition technique.The morphology variation of highly boron-doped diamond films grown on porous titanium substrates was investigated,and the effects of carbon concentration on nucleation density and diamond growth were also studied.The continuous change of surface morphology and structure of diamond film were characterized by scanning electron microscopy.The structures of diamond film and interlayer were analyzed by X-ray diffraction.The quality of boron-doped diamond film was confirmed by visible Raman spectroscopy.The experimental results reveal that surface morphology and quality of boron-doped diamond films are various due to the change of carbon concentration.The thickness of intermediate layer decreases with the carbon concentration increasing.

  4. Electroanalysis of tetracycline using nickel-implanted boron-doped diamond thin film electrode applied to flow injection system.

    Science.gov (United States)

    Treetepvijit, Surudee; Chuanuwatanakul, Suchada; Einaga, Yasuaki; Sato, Rika; Chailapakult, Orawon

    2005-05-01

    The electrochemical analysis of tetracycline was investigated using nickel-implanted boron-doped diamond thin film electrode by cyclic voltammetry and amperometry with a flow injection system. Cyclic voltammetry was used to study the electrochemical oxidation of tetracycline. Comparison experiments were carried out using as-deposited boron-doped diamond thin film electrode (BDD). Nickel-implanted boron-doped diamond thin film electrode (Ni-DIA) provided well-resolved oxidation irreversible cyclic voltammograms. The current signals were higher than those obtained using the as-deposited BDD electrode. Results using nickel-implanted boron-doped diamond thin film electrode in flow injection system coupled with amperometric detection are presented. The optimum potential for tetracycline was 1.55 V versus Ag/AgCl. The linear range of 1.0 to 100 microM and the detection limit of 10 nM were obtained. In addition, the application for drug formulation was also investigated.

  5. Seebeck coefficient and electrical conductivity of doped Beta-Boron

    International Nuclear Information System (INIS)

    Beta-rhombohedral boron (β-B) was investigated to determine its potential for use as a high temperature thermoelectric material. Single dopants to produce n or p-type material were found. The figure of merit for both types of materials is less than that of silicongermanium thermoelectric alloys

  6. Green synthesis of boron doped graphene and its application as high performance anode material in Li ion battery

    Energy Technology Data Exchange (ETDEWEB)

    Sahoo, Madhumita; Sreena, K.P.; Vinayan, B.P.; Ramaprabhu, S., E-mail: ramp@iitm.ac.in

    2015-01-15

    Graphical abstract: Boron doped graphene (B-G), synthesized by simple hydrogen induced reduction technique using boric acid as boron precursor, have more uneven surface as a result of smaller bonding distance of boron compared to carbon, showed high capacity and high rate capability compared to pristine graphene as an anode material for Li ion battery application. - Abstract: The present work demonstrates a facile route for the large-scale, catalyst free, and green synthesis approach of boron doped graphene (B-G) and its use as high performance anode material for Li ion battery (LIB) application. Boron atoms were doped into graphene framework with an atomic percentage of 5.93% via hydrogen induced thermal reduction technique using graphite oxide and boric acid as precursors. Various characterization techniques were used to confirm the boron doping in graphene sheets. B-G as anode material shows a discharge capacity of 548 mAh g{sup −1} at 100 mA g{sup −1} after 30th cycles. At high current density value of 1 A g{sup −1}, B-G as anode material enhances the specific capacity by about 1.7 times compared to pristine graphene. The present study shows a simplistic way of boron doping in graphene leading to an enhanced Li ion adsorption due to the change in electronic states.

  7. Influence of structural disorder and Coulomb interactions in the superconductor-insulator transition applied to boron doped diamond

    OpenAIRE

    McIntosh, R.; Mohanta, N.; Taraphder, A.; Bhattacharyya, S.

    2015-01-01

    The influence of disorder, both structural (non-diagonal) and on-site (diagonal), is studied through the inhomogeneous Bogoliubov-de Gennes (BdG) theory in narrow-band disordered superconductors with a view towards understanding superconductivity in boron doped diamond (BDD) and boron- doped nanocrystalline diamond (BNCD) films. We employ the attractive Hubbard model within the mean field approximation, including the Coulomb interaction between holes in the narrow acceptor band. We study subs...

  8. Quantum study of hydrogen interaction with plasma-facing graphite and boron doped graphite surfaces

    International Nuclear Information System (INIS)

    Hydrogen adsorption and absorption on carbon materials play an important role in plasma surface interactions in thermonuclear controlled fusion devices. The density functional theory has been used in order to investigate the interaction of hydrogen atoms with the basal (0001) plane of pure graphite and boron-doped graphite; these materials are taken as models of carbon armor of plasma facing components in tokamaks. We have shown that hydrogen adsorbs weakly on the graphite surface making the adsorbent carbon tetrahedral (sp3). It can also penetrate into the bulk through the surface aromatic cycles with a barrier of energy low compared to the energy of the impinging particles coming from the boundary plasma of tokamaks. Boron doping reinforces strongly the C-H bonding energy and decreases dramatically the energy barrier associated to hydrogen diffusion into the bulk. We have also investigated the H2 recombination on the same substrate through Eley-Rideal and Langmuir-Hinshelwood mechanisms. (authors)

  9. Communication: Towards catalytic nitric oxide reduction via oligomerization on boron doped graphene

    Science.gov (United States)

    Cantatore, Valentina; Panas, Itai

    2016-04-01

    We use density functional theory to describe a novel way for metal free catalytic reduction of nitric oxide NO utilizing boron doped graphene. The present study is based on the observation that boron doped graphene and O—N=N—O- act as Lewis acid-base pair allowing the graphene surface to act as a catalyst. The process implies electron assisted N=N bond formation prior to N—O dissociation. Two N2 + O2 product channels, one of which favoring N2O formation, are envisaged as outcome of the catalytic process. Besides, we show also that the N2 + O2 formation pathways are contrasted by a side reaction that brings to N3O3- formation and decomposition into N2O + NO2-.

  10. Boron doped ZnO embedded into reduced graphene oxide for electrochemical supercapacitors

    Science.gov (United States)

    Alver, Ü.; Tanrıverdi, A.

    2016-08-01

    In this work, reduced graphene oxide/boron doped zinc oxide (RGO/ZnO:B) composites were fabricated by a hydrothermal process and their electrochemical properties were investigated as a function of dopant concentration. First, boron doped ZnO (ZnO:B) particles was fabricated with different boron concentrations (5, 10, 15 and 20 wt%) and then ZnO:B particles were embedded into RGO sheets. The physical properties of sensitized composites were characterized by XRD and SEM. Characterization indicated that the ZnO:B particles with plate-like structure in the composite were dispersed on graphene sheets. The electrochemical properties of the RGO/ZnO:B composite were investigated through cyclic voltammetry, galvanostatic charge/discharge measurements in a 6 M KOH electrolyte. Electrochemical measurements show that the specific capacitance values of RGO/ZnO:B electrodes increase with increasing boron concentration. RGO/ZnO:B composite electrodes (20 wt% B) display the specific capacitance as high as 230.50 F/g at 5 mV/s, which is almost five times higher than that of RGO/ZnO (52.71 F/g).

  11. Copper diffusivity in boron-doped silicon wafer measured by dynamic secondary ion mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    Koh, Songfoo [S.E.H (M) Sdn. Bhd., Lot 2, Lorong Enggang 35, Ulu Klang FTZ, 54200 Selangor (Malaysia); You, Ahheng [Faculty of Engineering and Technology, Multimedia University, Jalan Ayer Keroh Lama, Bukit Beruang, 75450 Melaka (Malaysia); Tou, Teckyong, E-mail: tytou@mmu.edu.my [Faculty of Engineering, Multimedia Univesity, Jalan Multimedia, 63100 Cyberjaya (Malaysia)

    2013-03-20

    Highlights: ► Effective copper diffusivity in boron-doped silicon wafer was measured. ► Dynamic secondary ion mass spectrometry was used. ► Interstitial copper ions were first drifted to surface region and allowed to back-diffuse. ► Boron concentration largely influenced the effect copper diffusivity. -- Abstract: The effective copper diffusivity (D{sub eff}) in boron-doped silicon wafer was measured using a Dynamic Secondary Ion Mass Spectrometry (D-SIMS) that was incorporated with an out-drift technique. By this technique, positive interstitial copper ions (Cu{sub I}{sup +}) migrated to the surface region when a continuous charge of electrons showered on the oxidized silicon wafer, which was also bombarded by primary O{sub 2}{sup +} ions. The Cu{sub I}{sup +} ions at the surface region diffused back to the bulk when the electron showering stopped. The D-SIMS recorded the real-time distribution of Cu{sub I}{sup +} ions, generating depth profiles for in-diffusion of copper for silicon-wafer samples with different boron concentrations. These were curve-fitted using the standard diffusion expressions to obtain different D{sub eff} values, and compared with other measurement techniques.

  12. Effects of boron-doping on the morphology and magnetic property of carbon nanotubes

    Institute of Scientific and Technical Information of China (English)

    JIANG Qi; QIAN Lan; YI Jing; ZHU Xiaotong; ZHAO Yong

    2007-01-01

    Boron carbide nanotubes (nano-fibers) was prepared by B powder and carbon nanotubes (CNTs) at high temperature in a vacuumed quartz tube.The morphology,microstructure,component and magnetic property of samples were characterized by transmission electron microscopy (TEM),X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS)and magnetic property measurement system (MPMS) controller.The results showed that B-doping CNTs have great difference in the morphology and magnetic property from those of pristine CNTs.

  13. Cu and Boron Doped Carbon Nitride for Highly Selective Oxidation of Toluene to Benzaldehyde

    Directory of Open Access Journals (Sweden)

    Hongling Han

    2015-07-01

    Full Text Available A novel Cu and boron doped graphitic carbon nitride catalyst (Cu-CNB was synthesized using cheap precursors and systematically characterized. The selective oxidation of toluene proceeded very smoothly over the catalyst at 70 °C using tert-butyl hydroperoxide (TBHP as the oxidant to exclusively afford benzaldehyde. The catalyst can be used for at least five cycles without decrease in activity and selectivity.

  14. Investigation of surface properties of boron doped diamond for developing neuron -machine interface

    OpenAIRE

    Vahidpour, Farnoosh

    2016-01-01

    Summary The main goal of this thesis is to study how diamond films advance the construction of the hybrid biological-solid state interfaces and to construct Micro-Electrode Arrays (MEAs) for neural recordings. First, a literature study was carried out to review diamond applications in biology for in vitro and in vivo and for Microelectrode arrays (MEAs). In order to develop diamond MEAs, nano crystalline diamond (NCD) and boron-doped nano crystalline diamond (BNCD) were synthetized on fuse...

  15. Reactivity of electrogenerated free hydroxyl radicals and activation of dioxygen on boron-doped diamond electrodes

    OpenAIRE

    Kapalka, Agnieszka

    2008-01-01

    Synthetic boron-doped diamond (BDD) thin film is an electrode material with high chemical and dimensional stability, low background current and a very wide potential window of water stability. Upon anodic polarization, BDD generates hydroxyl radicals that mediate the oxidation processes in the vicinity of the electrode surface. These hydroxyl radials are assumed to be free, i.e., not adsorbed on the electrode surface. Hydroxyl radicals are formed on BDD during water discharge, which is the ra...

  16. Boron-doped nanocrystalline diamond electrodes for neural interfaces: In vivo biocompatibility evaluation

    OpenAIRE

    María eAlcaide; Andrew eTaylor; Morten eFjorback; Vladimir eZachar; Cristian Pablo Pennisi

    2016-01-01

    Boron-doped nanocrystalline diamond (BDD) electrodes have recently attracted attention as materials for neural electrodes due to their superior physical and electrochemical properties, however their biocompatibility remains largely unexplored. In this work, we aim to investigate the in vivo biocompatibility of BDD electrodes in relation to conventional titanium nitride (TiN) electrodes using a rat subcutaneous implantation model. High quality BDD films were synthesized on electrodes intended ...

  17. Boron-Doped Nanocrystalline Diamond Electrodes for Neural Interfaces: In vivo Biocompatibility Evaluation

    OpenAIRE

    Alcaide, María; Taylor, Andrew; Fjorback, Morten; Zachar, Vladimir; Pennisi, Cristian P.

    2016-01-01

    Boron-doped nanocrystalline diamond (BDD) electrodes have recently attracted attention as materials for neural electrodes due to their superior physical and electrochemical properties, however their biocompatibility remains largely unexplored. In this work, we aim to investigate the in vivo biocompatibility of BDD electrodes in relation to conventional titanium nitride (TiN) electrodes using a rat subcutaneous implantation model. High quality BDD films were synthesized on electrodes intended ...

  18. Silicon-Based Thermoelectrics Made from a Boron-Doped Silicon Dioxide Nanocomposite

    OpenAIRE

    Snedaker, ML; Zhang, Y.; Birkel, CS; H. Wang; Day, T.; Shi, Y; Ji, X.; Kraemer, S.; Mills, CE; Moosazadeh, A; Moskovits, M.; Snyder, GJ; Stucky, GD

    2013-01-01

    We report a method for preparing p-type silicon germanium bulk alloys directly from a boron-doped silica germania nanocomposite. This is the first successful attempt to produce and characterize the thermoelectric properties of SiGe-based thermoelectric materials prepared at temperatures below the alloy's melting point through a magnesiothermic reduction of the silica-germania nanocomposite. We observe a thermoelectric power factor that is competitive with the literature record obtained for hi...

  19. Cu and Boron Doped Carbon Nitride for Highly Selective Oxidation of Toluene to Benzaldehyde.

    Science.gov (United States)

    Han, Hongling; Ding, Guodong; Wu, Tianbin; Yang, Dexin; Jiang, Tao; Han, Buxing

    2015-07-13

    A novel Cu and boron doped graphitic carbon nitride catalyst (Cu-CNB) was synthesized using cheap precursors and systematically characterized. The selective oxidation of toluene proceeded very smoothly over the catalyst at 70 °C using tert-butyl hydroperoxide (TBHP) as the oxidant to exclusively afford benzaldehyde. The catalyst can be used for at least five cycles without decrease in activity and selectivity.

  20. Investigations of electrochemical oxygen transfer reaction on boron-doped diamond electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Kapalka, Agnieszka; Foti, Gyoergy [Institute of Chemical Sciences and Engineering, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland); Comninellis, Christos [Institute of Chemical Sciences and Engineering, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland)], E-mail: christos.comninellis@epfl.ch

    2007-12-31

    In this paper, the electrochemical oxygen transfer reaction (EOTR) is studied on boron-doped diamond electrodes using simple C{sub 1} organic compounds (methanol and formic acid). The kinetics of both oxygen evolution (side reaction) and organics oxidation (main reaction) has been investigated using boron-doped diamond microelectrodes-array (BDD MEA). Oxygen evolution, in the high-potential region, takes place with a Tafel slope of 120 mV dec{sup -1} and zero reaction order with respect to H{sup +}. In the presence of organics, a shift of the polarization curves to lower potentials is observed while the Tafel slopes remain close to 120 mV dec{sup -1}. A simplified model of C{sub 1} organics oxidation is proposed. Both water discharge and organics oxidation are assumed to be fast reactions. The slowest step of the studied EOTR is the anodic discharge of hydroxyl radicals to oxygen. Further in this work, electrolysis of formic acid on boron-doped diamond macroelectrode is presented. In order to achieve 100% current efficiency, electrolysis was carried out under programmed current, in which the current density was adjusted to the limiting value.

  1. Effect of nitrogen on deposition and field emission properties of boron-doped micro-and nano-crystalline diamond films

    Institute of Scientific and Technical Information of China (English)

    L.A. Li; S.H. Cheng; H.D. Li; Q. Yu; J.W. Liu; X.Y. Lv

    2010-01-01

    In this paper, we report the effect of nitrogen on the deposition and properties of boron doped diamond films synthesized by hot filament chemical vapor deposition. The diamond films consisting of micro-grains (nano-grains) were realized with low (high) boron source flow rate during the growth processes. The transition of micro-grains to nano-grains is speculated to be strongly (weekly) related with the boron (nitrogen) flow rate. The grain size and Raman spectral feature vary insignificantly as a function of the nitrogen introduction at a certain boron flow rate. The variation of electron field emission characteristics dependent on nitrogen is different between microcrystalline and nanocrystalline boron doped diamond samples, which are related to the combined phase composition, boron doping level and texture structure. There is an optimum nitrogen proportion to improve the field emission properties of the boron-doped films.

  2. Boron-doped cadmium oxide composite structures and their electrochemical measurements

    Energy Technology Data Exchange (ETDEWEB)

    Lokhande, B.J., E-mail: bjlokhande@yahoo.com [Lab of Smart Mtrls Supercapacitive and Energy Studies, School of Physical Sciences, Solapur University, Solapur 413255, Maharashtra (India); Ambare, R.C. [Lab of Smart Mtrls Supercapacitive and Energy Studies, School of Physical Sciences, Solapur University, Solapur 413255, Maharashtra (India); Mane, R.S. [School of Physical Sciences, Swami Ramanand Teerth Marathwada University, Nanded 431606 (India); Bharadwaj, S.R. [Chemistry Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400085 (India)

    2013-08-01

    Graphical abstract: Conducting nano-fibrous 3% boron doped cadmium oxide thin films were prepared by SILAR and its super capacitive properties were studied. - Highlights: • Samples are of nanofibrous nature. • All samples shows pseudocapacitive behavior. • 3% B doped CdO shows good specific capacitance. • 3% B doped CdO shows maximum 74.93% efficiency at 14 mA/cm{sup 2}. • 3% B doped CdO shows 0.8 Ω internal resistance. - Abstract: Boron-doped and undoped cadmium oxide composite nanostructures in thin film form were prepared onto stainless steel substrates by a successive ionic layer adsorption and reaction method using aqueous solutions of cadmium nitrate, boric acid and 1% H{sub 2}O{sub 2}. As-deposited films were annealed at 623 K for 1 h. The X-ray diffraction study shows crystalline behavior for both doped and undoped films with a porous topography and nano-wires type architecture, as observed in SEM image. Wettability test confirms the hydrophilic surface with 58° contact angle value. Estimated band gap energy is around 1.9 eV. Electrochemical behavior of the deposited films is attempted in 1 M KOH electrolyte using cyclic voltammetry (CV), electrochemical impedance spectroscopy and galvanostatic charge–discharge tests. Maximum values of the specific capacitance, specific energy and specific power obtained for 3% B doped CdO film at 2 mV/s scan rate are 20.05 F/g, 1.22 Wh/kg and 3.25 kW/kg, respectively.

  3. Effect of diborane on the microstructure of boron-doped silicon nanowires

    Science.gov (United States)

    Pan, Ling; Lew, Kok-Keong; Redwing, Joan M.; Dickey, Elizabeth C.

    2005-04-01

    Boron-doped silicon (Si) nanowires, with nominal diameters of 80 nm, were grown via the vapor-liquid-solid (VLS) mechanism using gold (Au) as a catalyst and silane (SiH 4) and diborane (B 2H 6) as precursors. The microstructure of the nanowires was studied by scanning electron microscopy, transmission electron microscopy and electron energy-loss spectroscopy. At lower B 2H 6 partial pressure and thus lower doping levels (⩽1×10 18 cm -3), most of the boron-doped Si nanowires exhibited high crystallinity. At higher B 2H 6 partial pressure (˜2×10 19 cm -3 doping level), the majority of the wires exhibited a core-shell structure with an amorphous Si shell (20-30 nm thick) surrounding a crystalline Si core. Au nanoparticles on the outer surface of the nanowires were also observed in structures grown with high B/Si gas ratios. The structural changes are believed to result from an increase in the rate of Si thin-film deposition on the outer surface of the nanowire at high B 2H 6 partial pressure, which produces the amorphous coating and also causes an instability at the liquid/solid interface resulting in a loss of Au during nanowire growth.

  4. Low-level boron doping and light-induced effects in amorphous silicon pin solar cells

    Science.gov (United States)

    Moeller, M.; Rauscher, B.; Kruehler, W.; Plaettner, R.; Pfleiderer, H.

    Amorphous silicon solar cells with the structure pin/ITO produced in the laboratory show an AM1 efficiency of up to 7.4 percent on 6 sq mm. The impact of doping the i-layer slightly with boron on the cell performance was studied together with its possible influence on the cell stability. Cells exposed to continuous AM1 illumination (up to 2000 hours) show a degradation of the efficiency. Differences in the bias-voltage during the deposition lead to significant differences in the stability whereas the influence of boron doping was not so prominent. The nu-tau-products for electrons and holes were shown to degrade differently through light-soaking for different doping-level. A further investigation was made by evaluating the frequency dependence of the capacitance via a new p i n junction model to obtain the density of states and the drift field in the i-layer for doping and light-soaking.

  5. Osmium Atoms and Os2 Molecules Move Faster on Selenium-Doped Compared to Sulfur-Doped Boronic Graphenic Surfaces

    OpenAIRE

    Barry, Nicolas P. E.; Pitto-Barry, Anaïs; Tran, Johanna; Spencer, Simon E. F.; Johansen, Adam M.; Sanchez, Ana M.; Dove, Andrew P.; O’Reilly, Rachel K.; Deeth, Robert J; Beanland, Richard; Sadler, Peter J

    2015-01-01

    We deposited Os atoms on S- and Se-doped boronic graphenic surfaces by electron bombardment of micelles containing 16e complexes [Os(p-cymene)(1,2-dicarba-closo-dodecarborane-1,2-diselenate/dithiolate)] encapsulated in a triblock copolymer. The surfaces were characterized by energy-dispersive X-ray (EDX) analysis and electron energy loss spectroscopy of energy filtered TEM (EFTEM). Os atoms moved ca. 26× faster on the B/Se surface compared to the B/S surface (233 ± 34 pm·s–1 versus 8.9 ± 1.9 ...

  6. Growth and nucleation regimes in boron doped silicon by dynamical x-ray diffraction

    International Nuclear Information System (INIS)

    The oxygen precipitation of highly (17.5 mΩ cm) and moderately (4.5 Ω cm) boron (B) doped silicon (Si) crystals at 780 °C is investigated by following in-situ the evolution of diffraction Pendellösung oscillations. All samples show an initial diffusion-driven growth process which may change over into Ostwald ripening. For the highly doped sample and involving a nucleation step at 450 °C for 30 h, the precipitate density ρ is enhanced by a factor of 8 as compared to the moderately doped sample. The influence of a high B concentration on ρ is dramatically higher for the samples directly heated to 780 °C, where an enhancement factor of 80 is found. Considering Ostwald ripening as a second growth regime reveals consistent ripening rates and surface energies σ with those found at 900 °C in a previous publication.

  7. Growth and nucleation regimes in boron doped silicon by dynamical x-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Will, J., E-mail: johannes.will@fau.de; Gröschel, A.; Bergmann, C.; Weißer, M.; Magerl, A. [Crystallography and Structural Physics, University of Erlangen-Nürnberg, Staudtstr. 3, 91058 Erlangen (Germany)

    2014-09-15

    The oxygen precipitation of highly (17.5 mΩ cm) and moderately (4.5 Ω cm) boron (B) doped silicon (Si) crystals at 780 °C is investigated by following in-situ the evolution of diffraction Pendellösung oscillations. All samples show an initial diffusion-driven growth process which may change over into Ostwald ripening. For the highly doped sample and involving a nucleation step at 450 °C for 30 h, the precipitate density ρ is enhanced by a factor of 8 as compared to the moderately doped sample. The influence of a high B concentration on ρ is dramatically higher for the samples directly heated to 780 °C, where an enhancement factor of 80 is found. Considering Ostwald ripening as a second growth regime reveals consistent ripening rates and surface energies σ with those found at 900 °C in a previous publication.

  8. Synthesis of boron and nitrogen doped graphene supporting PtRu nanoparticles as catalysts for methanol electrooxidation

    Energy Technology Data Exchange (ETDEWEB)

    Lu, Jiming; Zhou, Yingke, E-mail: zhouyk888@hotmail.com; Tian, Xiaohui; Xu, Xiao; Zhu, Hongxi; Zhang, Shaowei; Yuan, Tao

    2014-10-30

    Highlights: • A single-step heat treatment approach is developed to synthesize boron and nitrogen doped graphene supporting PtRu nanocatalysts. • The introduction of boron or nitrogen containing function groups into graphene can modulate the particle size and dispersion of the supporting PtRu nanoparticles. • The optimized catalysts present high electrocatalytic activity and excellent stability for methanol oxidation reaction. - Abstract: In this study, we demonstrate a single-step heat treatment approach to synthesize boron and nitrogen doped graphene supporting PtRu electrocatalysts for methanol electro-oxidation reaction. The reduction of graphene oxide, boron or nitrogen doping of graphene and loading of PtRu nanoparticles happened simultaneously during the reaction process. The morphologies and microstructures of the as-prepared catalysts were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The electrocatalytic methanol oxidation activity and durability of the obtained catalysts were evaluated by the cyclic voltammetry and chronoamperometric techniques. The results reveal that the boron and nitrogen doped graphene supporting PtRu electrocatalysts can be successfully prepared by the single step heat treatment technique, and the introduction of boron or nitrogen containing function groups into the reduced graphene sheets could modulate the particle size and dispersion of the supporting PtRu nanoparticles and improve the electrocatalytic performance of methanol oxidation reaction. The optimal annealing temperature is 800 °C, the preferable heat treatment time is 60 min for the nitrogen-doped catalysts and 90 min for the boron-doped catalysts, and the catalysts prepared under such conditions present superior catalytic activities for methanol oxidation than those prepared under other heat treatment conditions.

  9. Synthesis of boron and nitrogen doped graphene supporting PtRu nanoparticles as catalysts for methanol electrooxidation

    International Nuclear Information System (INIS)

    Highlights: • A single-step heat treatment approach is developed to synthesize boron and nitrogen doped graphene supporting PtRu nanocatalysts. • The introduction of boron or nitrogen containing function groups into graphene can modulate the particle size and dispersion of the supporting PtRu nanoparticles. • The optimized catalysts present high electrocatalytic activity and excellent stability for methanol oxidation reaction. - Abstract: In this study, we demonstrate a single-step heat treatment approach to synthesize boron and nitrogen doped graphene supporting PtRu electrocatalysts for methanol electro-oxidation reaction. The reduction of graphene oxide, boron or nitrogen doping of graphene and loading of PtRu nanoparticles happened simultaneously during the reaction process. The morphologies and microstructures of the as-prepared catalysts were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The electrocatalytic methanol oxidation activity and durability of the obtained catalysts were evaluated by the cyclic voltammetry and chronoamperometric techniques. The results reveal that the boron and nitrogen doped graphene supporting PtRu electrocatalysts can be successfully prepared by the single step heat treatment technique, and the introduction of boron or nitrogen containing function groups into the reduced graphene sheets could modulate the particle size and dispersion of the supporting PtRu nanoparticles and improve the electrocatalytic performance of methanol oxidation reaction. The optimal annealing temperature is 800 °C, the preferable heat treatment time is 60 min for the nitrogen-doped catalysts and 90 min for the boron-doped catalysts, and the catalysts prepared under such conditions present superior catalytic activities for methanol oxidation than those prepared under other heat treatment conditions

  10. Tuning dissociation using isoelectronically doped graphene and hexagonal boron nitride: Water and other small molecules

    Science.gov (United States)

    Al-Hamdani, Yasmine S.; Alfè, Dario; von Lilienfeld, O. Anatole; Michaelides, Angelos

    2016-04-01

    Novel uses for 2-dimensional materials like graphene and hexagonal boron nitride (h-BN) are being frequently discovered especially for membrane and catalysis applications. Still however, a great deal remains to be understood about the interaction of environmentally and industrially relevant molecules such as water with these materials. Taking inspiration from advances in hybridising graphene and h-BN, we explore using density functional theory, the dissociation of water, hydrogen, methane, and methanol on graphene, h-BN, and their isoelectronic doped counterparts: BN doped graphene and C doped h-BN. We find that doped surfaces are considerably more reactive than their pristine counterparts and by comparing the reactivity of several small molecules, we develop a general framework for dissociative adsorption. From this a particularly attractive consequence of isoelectronic doping emerges: substrates can be doped to enhance their reactivity specifically towards either polar or non-polar adsorbates. As such, these substrates are potentially viable candidates for selective catalysts and membranes, with the implication that a range of tuneable materials can be designed.

  11. Large-Scale Sublattice Asymmetry in Pure and Boron-Doped Graphene.

    Science.gov (United States)

    Usachov, Dmitry Yu; Fedorov, Alexander V; Vilkov, Oleg Yu; Petukhov, Anatoly E; Rybkin, Artem G; Ernst, Arthur; Otrokov, Mikhail M; Chulkov, Evgueni V; Ogorodnikov, Ilya I; Kuznetsov, Mikhail V; Yashina, Lada V; Kataev, Elmar Yu; Erofeevskaya, Anna V; Voroshnin, Vladimir Yu; Adamchuk, Vera K; Laubschat, Clemens; Vyalikh, Denis V

    2016-07-13

    The implementation of future graphene-based electronics is essentially restricted by the absence of a band gap in the electronic structure of graphene. Options of how to create a band gap in a reproducible and processing compatible manner are very limited at the moment. A promising approach for the graphene band gap engineering is to introduce a large-scale sublattice asymmetry. Using photoelectron diffraction and spectroscopy we have demonstrated a selective incorporation of boron impurities into only one of the two graphene sublattices. We have shown that in the well-oriented graphene on the Co(0001) surface the carbon atoms occupy two nonequivalent positions with respect to the Co lattice, namely top and hollow sites. Boron impurities embedded into the graphene lattice preferably occupy the hollow sites due to a site-specific interaction with the Co pattern. Our theoretical calculations predict that such boron-doped graphene possesses a band gap that can be precisely controlled by the dopant concentration. B-graphene with doping asymmetry is, thus, a novel material, which is worth considering as a good candidate for electronic applications. PMID:27248659

  12. Experimental evaluation of neutron performance in boron-doped low activation concrete

    International Nuclear Information System (INIS)

    Reaction rate distribution in concrete with/without boron dopant up to a thickness of 60 cm was measured using Yayoi fast reactor located at Univ. of Tokyo. The 7 reaction rates such as 197Au(n, γ), 59Co(n, γ), 115In(n, n'), 55Mn(n, γ), 23Na(n, γ), 94Zr(n, γ) and 96Zr(n, γ) were measured at 12 different depths, and the reduction of the reaction rate as a result of boron doping was quantitatively analysed. These reaction rates were also used to determine epithermal neutron spectrum shape parameter. Monte Carlo simulations of the experimental setup were performed using the MCNP-5 code. Simulated depth profiles of reaction rates and the epithermal neutron spectrum shape parameter agreed with the experimental results with fair accuracy. This experimental results provide useful data to benchmark the accuracy of neutron transport codes in the prediction of transmission and neutron spectrum distortion in boron-doped concrete. (authors)

  13. Investigation of optical, structural and morphological properties of nanostructured boron doped TiO2 thin films

    Indian Academy of Sciences (India)

    Savaş Sönmezoǧlu; Banu Erdoǧan; İskender Askeroǧlu

    2013-12-01

    Pure and different ratios (1, 3, 5, 7 and 10%) of boron doped TiO2 thin films were grown on the glass substrate by using sol–gel dip coating method having some benefits such as basic and easy applicability compared to other thin film production methods. To investigate the effect of boron doped on the physical properties of TiO2, structural, morphological and optical properties of growth thin films were examined. 1% boron-doping has no effect on optical properties of TiO2 thin film; however, optical properties vary with > 1%. From X-ray diffraction spectra, it is seen that TiO2 thin films together with doping of boron were formed along with TiB2 hexagonal structure having (111) orientation, B2O3 cubic structure having (310) orientation, TiB0.024O2 tetragonal structure having rutile phase (110) orientation and polycrystalline structures. From SEM images, it is seen that particles together with doping of boron have homogeneously distributed and held onto surface.

  14. Investigation of charges carrier density in phosphorus and boron doped SiNx:H layers for crystalline silicon solar cells

    International Nuclear Information System (INIS)

    Highlights: ► We investigate the properties of phosphorus and boron-doped silicon nitride films. ► Phosphorus-doped layers yield higher lifetimes than undoped ones. ► The fixed charges density decreases when increasing the films phosphorus content. ► Boron-doped films feature very low lifetimes. ► These doped layers are of particular interest for crystalline silicon solar cells. -- Abstract: Dielectric layers are of major importance in crystalline silicon solar cells processing, especially as anti-reflection coatings and for surface passivation purposes. In this paper we investigate the fixed charge densities (Qfix) and the effective lifetimes (τeff) of phosphorus (P) and boron (B) doped silicon nitride layers deposited by plasma-enhanced chemical vapour deposition. P-doped layers exhibit a higher τeff than standard undoped layers. In contrast, B-doped layers exhibit lower τeff. A strong Qfix decrease is to be seen when increasing the P content within the film. Based on numerical simulations we also demonstrate that the passivation obtained with P- and B-doped layers are limited by the interface states rather than by the fixed charges

  15. Aluminum- and boron-co-doped ZnO ceramics: structural, morphological and electrical characterization

    Science.gov (United States)

    Liu, Shimin; Liu, Jindong; Jiang, Weiwei; Liu, Chaoqian; Ding, Wanyu; Wang, Hualin; Wang, Nan

    2016-10-01

    Highly dense and electrically conductive aluminum- and boron-co-doped ZnO (ABZO) ceramics were prepared by traditional pressureless sintering process. Single aluminum-doped ZnO (AZO) ceramics were synthesized with similar process and characterized for comparison. The densification behavior, crystal structure, morphology, composition and electrical properties of the ceramics were studied. Results indicated that AZO ceramics with the maximum relative density of 99.01 % were obtained only at 1350 °C for 4 h, which, however, was accompanied by electrical conductivity deterioration because of the increased insulated ZnAl2O4 phase formed in ceramics. Interestingly, the ABZO ceramics reached the maximum relative density of 98.84 % at 1100 °C, which was 250 °C lower compared with that of AZO ceramics. Moreover, the electrical conductivity of ABZO ceramics improved significantly with the increased sintering temperature and increased insulated ZnAl2O4 phase, which should be ascribed to the decreased grain boundaries and the resultant reduced carrier scattering in ceramics overcoming the influence of increased ZnAl2O4 phase due to boron doping effect.

  16. Bare and boron-doped cubic silicon carbide nanowires for electrochemical detection of nitrite sensitively

    Science.gov (United States)

    Yang, Tao; Zhang, Liqin; Hou, Xinmei; Chen, Junhong; Chou, Kuo-Chih

    2016-04-01

    Fabrication of eletrochemical sensors based on wide bandgap compound semiconductors has attracted increasing interest in recent years. Here we report for the first time electrochemical nitrite sensors based on cubic silicon carbide (SiC) nanowires (NWs) with smooth surface and boron-doped cubic SiC NWs with fin-like structure. Multiple techniques including scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) were used to characterize SiC and boron-doped SiC NWs. As for the electrochemical behavior of both SiC NWs electrode, the cyclic voltammetric results show that both SiC electrodes exhibit wide potential window and excellent electrocatalytic activity toward nitrite oxidation. Differential pulse voltammetry (DPV) determination reveals that there exists a good linear relationship between the oxidation peak current and the concentration in the range of 50–15000 μmoL L‑1 (cubic SiC NWs) and 5–8000 μmoL L‑1 (B-doped cubic SiC NWs) with the detection limitation of 5 and 0.5 μmoL L‑1 respectively. Compared with previously reported results, both as-prepared nitrite sensors exhibit wider linear response range with comparable high sensitivity, high stability and reproducibility.

  17. Boron-doped few-walled carbon nanotubes: novel synthesis and properties

    Science.gov (United States)

    Preston, Colin; Song, Da; Taillon, Josh; Cumings, John; Hu, Liangbing

    2016-11-01

    Few-walled carbon nanotubes offer a unique marriage of graphitic quality and robustness to ink-processing; however, doping procedures that may alter the band structure of these few-walled nanotubes are still lacking. This report introduces a novel solution-injected chemical vapor deposition growth process to fabricate the first boron-doped few-walled carbon nanotubes (B-FWNTs) reported in literature, which may have extensive applications in battery devices. A comprehensive characterization of the as-grown B-FWNTs confirms successful boron substitution in the graphitic lattice, and reveals varying growth parameters impact the structural properties of B-FWNT yield. An investigation into the optimal growth purification parameters and ink-making procedures was also conducted. This study introduces the first process technique to successfully grow intrinsically p-doped FWNTs, and provides the first investigation into the impact factors of the growth parameters, purification steps, and ink-making processes on the structural properties of the B-FWNTs and the electrical properties of the resulting spray-coated thin-film electrodes.

  18. Electrical activation in boron doped polycrystalline Si formed by sequential lateral solidification

    International Nuclear Information System (INIS)

    We have investigated the electrical activation in boron doped poly-Si using Hall measurement, 4-point probe, and secondary ion mass spectroscopy. Through doping was conducted using a mass-separated ion implanter with acceleration energies from 20 to 35 keV at doses ranging from 1 x 1015/cm2 to 4 x 1015/cm2, followed by isothermal rapid-thermal-annealing at temperatures ranging from 550 to 650 deg. C. The substrates used were poly-Si, produced by two-shot sequential lateral solidification. Reverse annealing, in which a continuous loss of charge carriers occurs, was observed in boron doped poly-Si. We found that implantation conditions play a critical role on dopant activation as well as annealing conditions. We observed that a certain implantation condition does exist where the sheet resistance is not changed upon activation annealing. Damage recovery encountered in activation annealing seems to be closely related to a reverse-annealing phenomenon. We assume that the defect-concentration profile would be more important to activation behavior of poly-Si than integrated defect-density accumulated in the silicon layer.

  19. Electrical activation in boron doped polycrystalline Si formed by sequential lateral solidification

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Won-Eui [Department of Materials Science and Engineering, Hongik University, Seoul 121-791 (Korea, Republic of); Kim, Deok Hoi; Kim, Chi Woo [LTPS Team, AMLCD Business, Samsung Mobile Display CO., Cheonan-si, ChoongchungNam-do 331-300 (Korea, Republic of); Ro, Jae-Sang, E-mail: jsang@wow.hongik.ac.kr [Department of Materials Science and Engineering, Hongik University, Seoul 121-791 (Korea, Republic of)

    2011-10-31

    We have investigated the electrical activation in boron doped poly-Si using Hall measurement, 4-point probe, and secondary ion mass spectroscopy. Through doping was conducted using a mass-separated ion implanter with acceleration energies from 20 to 35 keV at doses ranging from 1 x 10{sup 15}/cm{sup 2} to 4 x 10{sup 15}/cm{sup 2}, followed by isothermal rapid-thermal-annealing at temperatures ranging from 550 to 650 deg. C. The substrates used were poly-Si, produced by two-shot sequential lateral solidification. Reverse annealing, in which a continuous loss of charge carriers occurs, was observed in boron doped poly-Si. We found that implantation conditions play a critical role on dopant activation as well as annealing conditions. We observed that a certain implantation condition does exist where the sheet resistance is not changed upon activation annealing. Damage recovery encountered in activation annealing seems to be closely related to a reverse-annealing phenomenon. We assume that the defect-concentration profile would be more important to activation behavior of poly-Si than integrated defect-density accumulated in the silicon layer.

  20. Bare and boron-doped cubic silicon carbide nanowires for electrochemical detection of nitrite sensitively.

    Science.gov (United States)

    Yang, Tao; Zhang, Liqin; Hou, Xinmei; Chen, Junhong; Chou, Kuo-Chih

    2016-04-25

    Fabrication of eletrochemical sensors based on wide bandgap compound semiconductors has attracted increasing interest in recent years. Here we report for the first time electrochemical nitrite sensors based on cubic silicon carbide (SiC) nanowires (NWs) with smooth surface and boron-doped cubic SiC NWs with fin-like structure. Multiple techniques including scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS) were used to characterize SiC and boron-doped SiC NWs. As for the electrochemical behavior of both SiC NWs electrode, the cyclic voltammetric results show that both SiC electrodes exhibit wide potential window and excellent electrocatalytic activity toward nitrite oxidation. Differential pulse voltammetry (DPV) determination reveals that there exists a good linear relationship between the oxidation peak current and the concentration in the range of 50-15000 μmoL L(-1) (cubic SiC NWs) and 5-8000 μmoL L(-1) (B-doped cubic SiC NWs) with the detection limitation of 5 and 0.5 μmoL L(-1) respectively. Compared with previously reported results, both as-prepared nitrite sensors exhibit wider linear response range with comparable high sensitivity, high stability and reproducibility.

  1. Boron

    Science.gov (United States)

    ... an eye wash. Boron was used as a food preservative between 1870 and 1920, and during World Wars ... chemical symbol), B (symbole chimique), Borate, Borate de Sodium, Borates, Bore, Boric Acid, Boric Anhydride, Boric Tartrate, ...

  2. Freestanding CVD boron doped diamond single crystals: A substrate for vertical power electronic devices?

    Energy Technology Data Exchange (ETDEWEB)

    Achard, J.; Issaoui, R.; Tallaire, A.; Silva, F.; Gicquel, A. [Universite Paris 13, Sorbonne Paris Cite, Laboratoire des Sciences des Procedes et des Materiaux, CNRS (UPR 3407), 93430 Villetaneuse (France); Barjon, J.; Jomard, F. [GEMaC, CNRS-Universite de Versailles St-Quentin, 45 av. des Etats-Unis, 78035 Versailles Cedex (France)

    2012-09-15

    The development of 'all-diamond' devices for power electronics is attracting more and more interest as judged by the recent increase in the number of publications on the subject. Nevertheless most devices reported in the literature used coplanar or pseudo-vertical geometries which, although promising in term of breakdown voltage, have still a relatively high on-state resistance. This could be related to current crowding due the low cross-section p{sup +} layer. Vertical configuration, which requires thick heavily doped substrates, is a possible alternative usually used in conventional semiconductors. In this study, chemical vapour deposition (CVD) diamond growth conditions allowing heavy boron doping over an important thickness are discussed. It was found that there is an optimal range of microwave power density (MWPD) for which reasonable doping efficiencies and growth rates can be obtained leading to hundreds of micrometers thick crystals with a doping level higher than 10{sup 20} cm{sup -3}. The crystal morphology was predicted thanks to a 3D geometrical model and a small addition of oxygen to the gas phase was efficient to avoid the appearance of undesirable crystals faces and keep the crystal integrity. Freestanding boron-doped diamond single crystals were eventually grown and characterized by secondary ion mass spectrometry (SIMS), Fourier transformed InfraRed (FTIR) spectroscopy, Raman spectroscopy, high resolution X-ray diffraction (HRXRD) and four-point probe measurements. The high quality of the synthetic crystals was confirmed exhibiting electrical resistivities as low as 0.26 {Omega} cm illustrating that this material is suitable for the development of vertical power electronic devices. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  3. Preparation and characterization of boron-doped titania nano-materials with antibacterial activity

    International Nuclear Information System (INIS)

    Highlights: ► B/TiO2 nano-materials are prepared and doping improves particles agglomeration. ► Absorption spectrum move to visible light after doped. ► B/TiO2 nano-materials firstly applied to the fields of antibacterial materials. ► Calcined at high temperature of 900 °C, B/TiO2 has still strong antibacterial. - Abstract: Boron-doped TiO2 (B/TiO2) nano-materials were synthesized by a sol–gel method and characterized by X-ray diffraction pattern (XRD), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectrum (FT-IR) and UV–vis diffuse reflectance spectra (DRS). With the test of bacterial inhibition zone, the antibacterial properties of B/TiO2 nano-materials on Escherichia coli were investigated. The results show that the structure of TiO2 could be transformed from amorphous to anatase and then to rutile by increasing calcination temperature; part of the boron atoms probably have been weaved into the interstitial TiO2 structure or incorporated into the TiO2 lattice through occupying O sites, whereas others exist as B2O3. The results of antibacterial experiment under visible light irradiation show that the B/TiO2 nano-materials exhibit enhanced antibacterial efficiency compared with non-doped TiO2. Ultimately, the action mechanism of B/TiO2 doping is discussed.

  4. Soft X-ray angle-resolved photoemission spectroscopy of heavily boron-doped superconducting diamond films

    Directory of Open Access Journals (Sweden)

    T. Yokoya, T. Nakamura, T. Matushita, T. Muro, H. Okazaki, M. Arita, K. Shimada, H. Namatame, M. Taniguchi, Y. Takano, M. Nagao, T. Takenouchi, H. Kawarada and T. Oguchi

    2006-01-01

    Full Text Available We have performed soft X-ray angle-resolved photoemission spectroscopy (SXARPES of microwave plasma-assisted chemical vapor deposition diamond films with different B concentrations in order to study the origin of the metallic behavior of superconducting diamond. SXARPES results clearly show valence band dispersions with a bandwidth of ~23 eV and with a top of the valence band at gamma point in the Brillouin zone, which are consistent with the calculated valence band dispersions of pure diamond. Boron concentration-dependent band dispersions near the Fermi level (EF exhibit a systematic shift of EF, indicating depopulation of electrons due to hole doping. These SXARPES results indicate that diamond bands retain for heavy boron doping and holes in the diamond band are responsible for the metallic states leading to superconductivity at low temperature. A high-resolution photoemission spectroscopy spectrum near EF of a heavily boron-doped diamond superconductor is also presented.

  5. Characterization and photocatalytic activity of boron-doped TiO2 thin films prepared by liquid phase deposition technique

    Indian Academy of Sciences (India)

    Noor Shahina Begum; H M Farveez Ahmed; O M Hussain

    2008-10-01

    Boron doped TiO2 thin films have been successfully deposited on glass substrate and silicon wafer at 30°C from an aqueous solution of ammonium hexa-fluoro titanate and boron trifluoride by liquid phase deposition technique. The boric acid was used as an – scavenger. The resultant films were characterized by XRD, EDAX, UV and microstructures by SEM. The result shows the deposited film to be amorphous which becomes crystalline between 400 and 500°C. The EDAX and XRD data confirm the existence of boron atom in TiO2 matrix and a small peak corresponding to rutile phase was also found. Boron doped TiO2 thin films can be used as photocatalyst for the photodegradation of chlorobenzene which is a great environmental hazard. It was found that chlorobenzene undergoes degradation efficiently in presence of boron doped TiO2 thin films by exposing its aqueous solution to visible light. The photocatalytic activity increases with increase in the concentration of boron.

  6. Plasma Synthesized Doped Boron Nanopowder for MgB2 Superconductors

    Energy Technology Data Exchange (ETDEWEB)

    James V. Marzik

    2012-03-26

    Under this program, a process to synthesize nano-sized doped boron powder by a plasma synthesis process was developed and scaled up from 20 gram batches at program start to over 200 grams by program end. Over 75 batches of boron nanopowder were made by RF plasma synthesis. Particle sizes were typically in the 20-200 nm range. The powder was synthesized by the reductive pyrolysis of BCl{sub 3} in hydrogen in an RF plasma. A wide range of process parameters were investigated including plasma power, torch geometry, gas flow rates, and process pressure. The powder-in-tube technique was used to make monofilament and multifilament superconducting wires. MgB{sub 2} wire made with Specialty Materials plasma synthesized boron nanopowder exhibited superconducting properties that significantly exceeded the program goals. Superconducting critical currents, J{sub c}, in excess of 10{sup 5} A cm{sup -2} at magnetic fields of 8 tesla were reproducibly achieved. The upper critical magnetic field in wires fabricated with program boron powder were H{sub c2}(0) = 37 tesla, demonstrating the potential of these materials for high field magnet applications. T{sub c} in carbon-doped MgB{sub 2} powder showed a systematic decrease with increasing carbon precursor gas flows, indicating the plasma synthesis process can give precise control over dopant concentrations. Synthesis rates increased by a factor of 400% over the course of the program, demonstrating the scalability of the powder synthesis process. The plasma synthesis equipment at Specialty Materials has successfully and reproducibly made high quality boron nanopowder for MgB{sub 2} superconductors. Research and development from this program enabled Specialty Materials to successfully scale up the powder synthesis process by a factor of ten and to double the size of its powder pilot plant. Thus far the program has been a technical success. It is anticipated that continued systematic development of plasma processing parameters, dopant

  7. Nanoscale Control of Rewriteable Doping Patterns in Pristine Graphene/Boron Nitride Heterostructures.

    Science.gov (United States)

    Velasco, Jairo; Ju, Long; Wong, Dillon; Kahn, Salman; Lee, Juwon; Tsai, Hsin-Zon; Germany, Chad; Wickenburg, Sebastian; Lu, Jiong; Taniguchi, Takashi; Watanabe, Kenji; Zettl, Alex; Wang, Feng; Crommie, Michael F

    2016-03-01

    Nanoscale control of charge doping in two-dimensional (2D) materials permits the realization of electronic analogs of optical phenomena, relativistic physics at low energies, and technologically promising nanoelectronics. Electrostatic gating and chemical doping are the two most common methods to achieve local control of such doping. However, these approaches suffer from complicated fabrication processes that introduce contamination, change material properties irreversibly, and lack flexible pattern control. Here we demonstrate a clean, simple, and reversible technique that permits writing, reading, and erasing of doping patterns for 2D materials at the nanometer scale. We accomplish this by employing a graphene/boron nitride heterostructure that is equipped with a bottom gate electrode. By using electron transport and scanning tunneling microscopy (STM), we demonstrate that spatial control of charge doping can be realized with the application of either light or STM tip voltage excitations in conjunction with a gate electric field. Our straightforward and novel technique provides a new path toward on-demand graphene p-n junctions and ultrathin memory devices. PMID:26852622

  8. Functionalization of Boron-Doped Nanocrystalline Diamond with N3 Dye Molecules

    OpenAIRE

    Yeap, Weng Siang; X. Liu; Bevk, David; Pasquarelli, A.; Lutsen, Laurence; Fahlman, M.; Maes, Wouter; Haenen, Ken

    2014-01-01

    N3 dye molecules [cis-bis(isothiocyanato)bis(2,2'-bipyridyl-4,4'-dicarboxylato)ruthenium(II)] are covalently attached to boron-doped nanocrystalline diamond (B:NCD) thin films through a combination of coupling chemistries, i.e., diazonium, Suzuki, and EDC-NHS. X-ray and ultraviolet photoelectron spectroscopy and near-edge X-ray absorption fine structure spectroscopy are used to verify the covalent bonding of the dye on the B:NCD surface (compared to a hydrogen-terminated reference). The spect...

  9. Neutral and charged boron-doped fullerenes for CO2 adsorption

    OpenAIRE

    de Silva, Suchitra W; Du, Aijun; Senadeera, Wijitha; Gu, Yuantong

    2014-01-01

    Recently, the capture and storage of CO2 have attracted research interest as a strategy to reduce the global emissions of greenhouse gases. It is crucial to find suitable materials to achieve an efficient CO2 capture. Here we report our study of CO2 adsorption on boron-doped C60 fullerene in the neutral state and in the 1e −-charged state. We use first principle density functional calculations to simulate the CO2 adsorption. The results show that CO2 can form weak interactions with the BC5...

  10. Effect of Heavily Doped Boron on Bandgap Narrowing of Strained SiGe Layers

    Institute of Scientific and Technical Information of China (English)

    YAO Fei; XUE Chun-Lai; CHENG Bu-Wen; WANG Qi-Ming

    2007-01-01

    Taking into account the compensation effect of B to Ge in strained SiGe layers for the first time, the effect of heavily doped boron on the bandgap narrowing of strained SiGe layers is calculated, and the classical Jain-Roulston (J-R) model is modified. The results show that our modified J-R model well fits the experimental values. Based on the modified J-R model, the real bandgap narrowing distribution between the conduction and valence bands is further calculated, which has great influence on modelling the electrical characteristics of SiGe heterojunction bipolar transistors.

  11. Localized electropolymerization on oxidized boron-doped diamond electrodes modified with pyrrolyl units.

    Science.gov (United States)

    Actis, Paolo; Manesse, Mael; Nunes-Kirchner, Carolina; Wittstock, Gunther; Coffinier, Yannick; Boukherroub, Rabah; Szunerits, Sabine

    2006-11-14

    This paper describes the functionalization of oxidized boron-doped diamond (BDD) electrodes with N-(3-trimethoxysilylpropyl)pyrrole (TMPP) and the influence of this layer on the electrochemical transfer kinetics as well as on the possibility of forming strongly adhesive polypyrrole films on the BDD interface through electropolymerization. Furthermore, localized polymer formation was achieved on the TMPP-modified BDD interface using the direct mode of a scanning electrochemical microscope (SECM) as well as an electrochemical scanning near-field optical microscope (E-SNOM). Depending on the method used polypyrrole dots with diameters in the range of 1-250 microm are electrogenerated. PMID:17066183

  12. Simultaneous Chronoamperometric Sensing of Ascorbic Acid and Acetaminophen at a Boron-Doped Diamond Electrode

    OpenAIRE

    Ciprian Radovan; Codruţa Cofan

    2008-01-01

    Cyclic voltammetry (CV) and chronoamperometry (CA) have been used to sense and determine simultaneously L-ascorbic acid (AA) and acetaminophen (AC) at a boron-doped diamond electrode (BDDE) in a Britton-Robinson buffer solution. The calibration plots of anodic current peak versus concentration obtained from CV and CA data for both investigated compounds in single and di-component solutions over the concentration range 0.01 mM – 0.1 mM proved to be linear, with very good correlation param...

  13. A detailed analysis of the Raman spectra in superconducting boron doped nanocrystalline diamond

    Energy Technology Data Exchange (ETDEWEB)

    Szirmai, Peter [Faculty of Physics, University of Vienna, Strudlhofgasse 4, 1090 Vienna (Austria); Department of Physics, Budapest University of Technology and Economics, PO Box 91, 1521 Budapest (Hungary); Pichler, Thomas [Faculty of Physics, University of Vienna, Strudlhofgasse 4, 1090 Vienna (Austria); Williams, Oliver A. [School of Physics and Astronomy, Cardiff University, Cardiff CF24 3AA (United Kingdom); Mandal, Soumen; Baeuerle, Christopher [Institut Neel - CNRS and Universite Joseph Fourier, 38042 Grenoble (France); Simon, Ferenc [Department of Physics, Budapest University of Technology and Economics, PO Box 91, 1521 Budapest (Hungary)

    2012-12-15

    The light scattering properties of superconducting (T{sub c} {approx} 3.8 K) heavily boron doped nanocrystalline diamond has been investigated by Raman spectroscopy using visible excitations. Fano type interference of the zone-center phonon line and the electronic continuum was identified. Lineshape analysis reveals Fano lineshapes with a significant asymmetry (q {approx} -2). An anomalous wavelength dependence and small value of the Raman scattering amplitude is observed in agreement with previous studies. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  14. A detailed analysis of the Raman spectra in superconducting boron doped nanocrystalline diamond

    International Nuclear Information System (INIS)

    The light scattering properties of superconducting (Tc ∼ 3.8 K) heavily boron doped nanocrystalline diamond has been investigated by Raman spectroscopy using visible excitations. Fano type interference of the zone-center phonon line and the electronic continuum was identified. Lineshape analysis reveals Fano lineshapes with a significant asymmetry (q ∼ -2). An anomalous wavelength dependence and small value of the Raman scattering amplitude is observed in agreement with previous studies. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  15. Effect of Boron-Doping on the Graphene Aerogel Used as Cathode for the Lithium-Sulfur Battery.

    Science.gov (United States)

    Xie, Yang; Meng, Zhen; Cai, Tingwei; Han, Wei-Qiang

    2015-11-18

    A porous interconnected 3D boron-doped graphene aerogel (BGA) was prepared via a one-pot hydrothermal treatment. The BGA material was first loaded with sulfur to serve as cathode in lithium-sulfur batteries. Boron was positively polarized on the graphene framework, allowing for chemical adsorption of negative polysufide species. Compared with nitrogen-doped and undoped graphene aerogel, the BGA-S cathode could deliver a higher capacity of 994 mA h g(-1) at 0.2 C after 100 cycles, as well as an outstanding rate capability, which indicated the BGA was an ideal cathode material for lithium-sulfur batteries.

  16. Adsorption Mechanism of Hydrogen on Boron-Doped Fullerenes

    Institute of Scientific and Technical Information of China (English)

    YU Liu-Min; SHI Guo-Sheng; WANG Zhi-Gang; JI Guang-Fu; LU Zhi-Peng

    2009-01-01

    The C35BH-H2 complex and two other possible isomers,C34BCαH-H2 and C34BCbH-H2,are investigated using the local-spin-density approximation (LSDA) method.The results indicate that a single hydrogen molecule could be strongly adsorbed on two isomers,C34BCaH and C34BCbH,with binding energies of 0.42 and 0.47eV,respectively,and that these calculated binding energies are suitable for reversible hydrogen adsorption/desorption near room temperature.However,it is difficult for the H2 molecule to be firmly adsorbed on C35BH.We analyze the interaction between C34BCxH (x = a,b) and the H2 molecule using dipole moments and molecular orbitals.The charge analysis showed there was a partial charge (about 0.32e)transfer from H2 to the doped fullerenes.These calculation results should broaden our understanding of the mechanisms of hydrogen storage using borondoped fullerenes.

  17. Influence of growth pressure on the electrical properties of boron-doped polycrystalline diamond films

    International Nuclear Information System (INIS)

    Heavily boron-doped diamond films are synthesized by the hot-filament chemical vapor deposition method under the gas mixtures of H2, CH4 and trimethyl borate. The measurement results of scanning electron microscopy, Raman spectroscopy, X-ray diffractometer and electrical properties showed the morphologies, microstructures, carrier concentration and superconducting transition temperature for as-grown diamond films were dependent on the change of growth pressure, and specially its carrier concentrations could be adjusted from 1019 to 1021 cm-3 by increasing growth pressures from 2.5 to 5 kPa. And further, the effects of growth pressure on the film microstructural property and the doping level dependence of the superconducting transition temperature were discussed.

  18. Complex boron redistribution kinetics in strongly doped polycrystalline-silicon/nitrogen-doped-silicon thin bi-layers

    Energy Technology Data Exchange (ETDEWEB)

    Abadli, S. [Department of Electrical Engineering, University Aout 1955, Skikda, 21000 (Algeria); LEMEAMED, Department of Electronics, University Mentouri, Constantine, 25000 (Algeria); Mansour, F. [LEMEAMED, Department of Electronics, University Mentouri, Constantine, 25000 (Algeria); Pereira, E. Bedel [CNRS-LAAS, 7 avenue du colonel Roche, 31077 Toulouse (France)

    2012-10-15

    We have investigated the complex behaviour of boron (B) redistribution process via silicon thin bi-layers interface. It concerns the instantaneous kinetics of B transfer, trapping, clustering and segregation during the thermal B activation annealing. The used silicon bi-layers have been obtained by low pressure chemical vapor deposition (LPCVD) method at 480 C, by using in-situ nitrogen-doped-silicon (NiDoS) layer and strongly B doped polycrystalline-silicon (P{sup +}) layer. To avoid long-range B redistributions, thermal annealing was carried out at relatively low-temperatures (600 C and 700 C) for various times ranging between 30 min and 2 h. To investigate the experimental secondary ion mass spectroscopy (SIMS) doping profiles, a redistribution model well adapted to the particular structure of two thin layers and to the effects of strong-concentrations has been established. The good adjustment of the simulated profiles with the experimental SIMS profiles allowed a fundamental understanding about the instantaneous physical phenomena giving and disturbing the complex B redistribution profiles-shoulders. The increasing kinetics of the B peak concentration near the bi-layers interface is well reproduced by the established model. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  19. Complex Boron Redistribution in P+ Doped-polysilicon / Nitrogen Doped Silicon Bi-layers during Activation Annealing

    Science.gov (United States)

    Abadli, S.; Mansour, F.; Perrera, E. Bedel

    We have investigated and modeled the complex phenomenon of boron (B) redistribution process in strongly doped silicon bilayers structure. A one-dimensional two stream transfer model well adapted to the particular structure of bi- layers and to the effects of strong-concentrations has been developed. This model takes into account the instantaneous kinetics of B transfer, trapping, clustering and segregation during the thermal B activation annealing. The used silicon bi-layers have been obtained by low pressure chemical vapor deposition (LPCVD) method, using in-situ nitrogen- doped-silicon (NiDoS) layer and strongly B doped polycrystalline-silicon (P+) layer. To avoid long redistributions, thermal annealing was carried out at relatively lowtemperatures (600 °C and 700 °C) for various times ranging between 30 minutes and 2 hours. The good adjustment of the simulated profiles with the experimental secondary ion mass spectroscopy (SIMS) profiles allowed a fundamental understanding about the instantaneous physical phenomena giving and disturbing the complex B redistribution profiles-shoulders kinetics.

  20. Defect charge states in Si doped hexagonal boron-nitride monolayer.

    Science.gov (United States)

    Mapasha, R E; Molepo, M P; Andrew, R C; Chetty, N

    2016-02-10

    We perform ab initio density functional theory calculations to investigate the energetics, electronic and magnetic properties of isolated stoichiometric and non-stoichiometric substitutional Si complexes in a hexagonal boron-nitride monolayer. The Si impurity atoms substituting the boron atom sites SiB giving non-stoichiometric complexes are found to be the most energetically favourable, and are half-metallic and order ferromagnetically in the neutral charge state. We find that the magnetic moments and magnetization energies increase monotonically when Si defects form a cluster. Partial density of states and standard Mulliken population analysis indicate that the half-metallic character and magnetic moments mainly arise from the Si 3p impurity states. The stoichiometric Si complexes are energetically unfavorable and non-magnetic. When charging the energetically favourable non-stoichiometric Si complexes, we find that the formation energies strongly depend on the impurity charge states and Fermi level position. We also find that the magnetic moments and orderings are tunable by charge state modulation q  =  -2, -1, 0, +1, +2. The induced half-metallic character is lost (retained) when charging isolated (clustered) Si defect(s). This underlines the potential of a Si doped hexagonal boron-nitride monolayer for novel spin-based applications.

  1. Raman Microscopic Analysis of Internal Stress in Boron-Doped Diamond

    Directory of Open Access Journals (Sweden)

    Kevin E. Bennet

    2015-05-01

    Full Text Available Analysis of the induced stress on undoped and boron-doped diamond (BDD thin films by confocal Raman microscopy is performed in this study to investigate its correlation with sample chemical composition and the substrate used during fabrication. Knowledge of this nature is very important to the issue of long-term stability of BDD coated neurosurgical electrodes that will be used in fast-scan cyclic voltammetry, as potential occurrence of film delaminations and dislocations during their surgical implantation can have unwanted consequences for the reliability of BDD-based biosensing electrodes. To achieve a more uniform deposition of the films on cylindrically-shaped tungsten rods, substrate rotation was employed in a custom-built chemical vapor deposition reactor. In addition to visibly preferential boron incorporation into the diamond lattice and columnar growth, the results also reveal a direct correlation between regions of pure diamond and enhanced stress. Definite stress release throughout entire film thicknesses was found in the current Raman mapping images for higher amounts of boron addition. There is also a possible contribution to the high values of compressive stress from sp2 type carbon impurities, besides that of the expected lattice mismatch between film and substrate.

  2. Hydrogen storage in Li-doped fullerene-intercalated hexagonal boron nitrogen layers

    Science.gov (United States)

    Cheng, Yi-Han; Zhang, Chuan-Yu; Ren, Juan; Tong, Kai-Yu

    2016-10-01

    New materials for hydrogen storage of Li-doped fullerene (C20, C28, C36, C50, C60, C70)-intercalated hexagonal boron nitrogen ( h-BN) frameworks were designed by using density functional theory (DFT) calculations. First-principles molecular dynamics (MD) simulations showed that the structures of the C n -BN ( n = 20, 28, 36, 50, 60, and 70) frameworks were stable at room temperature. The interlayer distance of the h-BN layers was expanded to 9.96-13.59 Å by the intercalated fullerenes. The hydrogen storage capacities of these three-dimensional (3D) frameworks were studied using grand canonical Monte Carlo (GCMC) simulations. The GCMC results revealed that at 77 K and 100 bar (10 MPa), the C50-BN framework exhibited the highest gravimetric hydrogen uptake of 6.86 wt% and volumetric hydrogen uptake of 58.01 g/L. Thus, the hydrogen uptake of the Li-doped C n -intercalated h-BN frameworks was nearly double that of the non-doped framework at room temperature. Furthermore, the isosteric heats of adsorption were in the range of 10-21 kJ/mol, values that are suitable for adsorbing/desorbing the hydrogen molecules at room temperature. At 193 K (-80 °C) and 100 bar for the Li-doped C50-BN framework, the gravimetric and volumetric uptakes of H2 reached 3.72 wt% and 30.08 g/L, respectively.

  3. Electrochemical Incineration of Phenolic Compounds from the Hydrocarbon Industry Using Boron-Doped Diamond Electrodes

    Directory of Open Access Journals (Sweden)

    Alejandro Medel

    2012-01-01

    Full Text Available Electrochemical incineration using boron-doped diamond electrodes was applied to samples obtained from a refinery and compared to the photo-electro-Fenton process in order to selectively eliminate the phenol and phenolic compounds from a complex matrix. Due to the complex chemical composition of the sample, a pretreatment to the sample in order to isolate the phenolic compounds was applied. The effects of the pretreatment and of pH on the degradation of the phenolic compounds were evaluated. The results indicate that the use of a boron-doped diamond electrode in an electrochemical incineration process mineralizes 99.5% of the phenolic sample content. Working in acidic medium (pH = 1, and applying 2 A at 298 K under constant stirring for 2 hours, also results in the incineration of the reaction intermediates reflected by 97% removal of TOC. In contrast, the photo-electro-Fenton process results in 99.9% oxidation of phenolic compounds with only a 25.69% removal of TOC.

  4. Electrochemical Properties of Boron-Doped Diamond Electrodes Prepared by Hot Cathode Direct Current Plasma CVD

    Directory of Open Access Journals (Sweden)

    Hong Yan PENG

    2016-05-01

    Full Text Available A series of boron-doped diamond (BDD films were deposited by using a hot cathode direct current plasma chemical vapor deposition(HCDC-PCVD system with different ratios of CH4/H2/B(OCH33 (trimethylborate gas mixture. The morphology, structure and quality of BDD films were controled by SEM, XRD and Raman measurements. The electrochemical properties of the BDD films were investigated by electrochemical methods. Cyclic voltammetric performances of the BDD films indicated that the main determinant in the electrochemical characteristics of BDD films was the boron doping amount. The threshold potential for oxygen evolution increased from 1 V to 2.5 V. Meanwhile, the electrochemical potential window of BDD films was enlarged from 2.2 V to 4.5 V when the B content was increased from 1.75 × 1019cm-3 to 2.4 × 1021 cm−3. The cyclic voltammograms of BDD films in K4Fe(CN6 and K3Fe(CN6 mixed solution indicated that the behavior of Fe(CN6-3/-4 redox couple could be regarded as semi-reversible.DOI: http://dx.doi.org/10.5755/j01.ms.22.2.12926

  5. Iron-boron pairing kinetics in illuminated p-type and in boron/phosphorus co-doped n-type silicon

    Energy Technology Data Exchange (ETDEWEB)

    Möller, Christian, E-mail: cmoeller@cismst.de [CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany); TU Ilmenau, Institut für Physik, Weimarer Str. 32, 98693 Ilmenau (Germany); Bartel, Til; Gibaja, Fabien [Calisolar GmbH, Magnusstraße 11, 12489 Berlin (Germany); Lauer, Kevin [CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany)

    2014-07-14

    Iron-boron (FeB) pairing is observed in the n-type region of a boron and phosphorus co-doped silicon sample which is unexpected from the FeB pair model of Kimerling and Benton. To explain the experimental data, the existing FeB pair model is extended by taking into account the electronic capture and emission rates at the interstitial iron (Fe{sub i}) trap level as a function of the charge carrier densities. According to this model, the charge state of the Fe{sub i} may be charged in n-type making FeB association possible. Further, FeB pair formation during illumination in p-type silicon is investigated. This permits the determination of the charge carrier density dependent FeB dissociation rate and in consequence allows to determine the acceptor concentration in the co-doped n-type silicon by lifetime measurement.

  6. Pros and cons of nickel- and boron-doping to study helium effects in ferritic/martensitic steels

    Science.gov (United States)

    Hashimoto, N.; Klueh, R. L.; Shiba, K.

    2002-12-01

    In the absence of a 14 MeV neutron source, the effect of helium on structural materials for fusion must be simulated using fission reactors. Helium effects in ferritic/martensitic steels have been studied by adding nickel and boron and irradiating in a mixed-spectrum reactor. Although the nickel- and boron-doping techniques have limitations and difficulties to estimate helium effects on the ferritic/martensitic steels, past irradiation experiments using these techniques have demonstrated similar effects on the swelling and Charpy impact properties that are indicative of a helium effect. Although both techniques have disadvantages, it should be possible to plan experiments using the nickel- and boron-doping techniques to develop an understanding of the effects of helium on mechanical properties.

  7. Boron-doped graphene as promising support for platinum catalyst with superior activity towards the methanol electrooxidation reaction

    Science.gov (United States)

    Sun, Yongrong; Du, Chunyu; An, Meichen; Du, Lei; Tan, Qiang; Liu, Chuntao; Gao, Yunzhi; Yin, Geping

    2015-12-01

    We report the synthesis of boron-doped graphene by thermally annealing the mixture of graphene oxide and boric acid, and its usage as the support of Pt catalyst towards the methanol oxidation reaction. The composition, structure and morphology of boron-doped graphene and its supported Pt nanoparticles (Pt/BG) are characterized by transmission electron microscopy, inductively coupled plasma mass spectrometry, Raman spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy. It is revealed that boron atoms are doped into graphene network in the form of BC2O and BCO2 bonds, which lead to the increase in defect sites and facilitate the subsequent deposition of Pt nanoparticles. Therefore, the Pt/BG catalyst presents smaller particle size and narrower size distribution than the graphene supported Pt (Pt/G) catalyst. When evaluated as the electrocatalyst for the methanol oxidation reaction, the Pt/BG catalyst exhibits excellent electrochemical activity and stability demonstrated by cyclic voltammetry and chronoamperometry tests. The enhanced activity is mainly ascribed to the electronic interaction between boron-doped graphene and Pt nanoparticles, which lowers the d-band center of Pt and thus weakens the absorption of the poisoning intermediate CO. Our work provides an alternative approach of improving the reaction kinetics for the oxidation of small organic molecules.

  8. Increased charge storage capacity of titanium nitride electrodes by deposition of boron-doped nanocrystalline diamond films

    DEFF Research Database (Denmark)

    Meijs, Suzan; McDonald, Matthew; Sørensen, Søren;

    2015-01-01

    The aim of this study was to investigate the feasibility of depositing a thin layer of boron-doped nanocrystalline diamond (B-NCD) on titanium nitride (TiN) coated electrodes and the effect this has on charge injection properties. The charge storage capacity increased by applying the B-NCD film...

  9. ortho-Selective phenol-coupling reaction by anodic treatment on boron-doped diamond electrode using fluorinated alcohols.

    Science.gov (United States)

    Kirste, Axel; Nieger, Martin; Malkowsky, Itamar M; Stecker, Florian; Fischer, Andreas; Waldvogel, Siegfried R

    2009-01-01

    Enlarged scope by fluorinated mediators: Oxyl radicals are easily formed on boron-doped diamond (BDD) electrodes and can be exploited for the ortho-selective coupling to the corresponding biphenols (see scheme). At partial conversion, a clean transformation is achieved that can be applied to electron-rich as well as fluorinated phenols.

  10. Boron concentration profiling by high angle annular dark field-scanning transmission electron microscopy in homoepitaxial δ-doped diamond layers

    Energy Technology Data Exchange (ETDEWEB)

    Araújo, D.; Alegre, M. P.; Piñero, J. C. [Dpto Ciencia de los Materiales, Facultad de Ciencias, Universidad de Cádiz, 11510 Puerto Real (Cádiz) (Spain); Fiori, A.; Bustarret, E. [Institut Néel, CNRS-Université Joseph Fourier, 25 av. des Martyrs, 38042 Grenoble (France); Jomard, F. [Groupe d' Etude de la Matière Condensée (GEMaC), UMR 8635 du CNRS, UVSQ, 45 av. des Etats-Unis, 78035 Versailles Cedex (France)

    2013-07-22

    To develop further diamond related devices, the concentration and spatial location of dopants should be controlled down to the nanometer scale. Scanning transmission electron microscopy using the high angle annular dark field mode is shown to be sensitive to boron doping in diamond epilayers. An analytical procedure is described, whereby local boron concentrations above 10{sup 20} cm{sup −3} were quantitatively derived down to nanometer resolution from the signal dependence on thickness and boron content. Experimental boron local doping profiles measured on diamond p{sup −}/p{sup ++}/p{sup −} multilayers are compared to macroscopic profiles obtained by secondary ion mass spectrometry, avoiding reported artefacts.

  11. Synthesis and characterization of boron-doped NiO thin films pro-duced by spray pyrolysis

    Institute of Scientific and Technical Information of China (English)

    U Alver; H Yaykasl; S Kerli; A Tanrverdi

    2013-01-01

    Boron-doped NiO thin films were prepared on glass substrates at 400◦C by airbrush spraying method using a solution of nickel nitrate hexahydrate. Their physical properties were investigated as a function of dopant concentration. From X-ray diff raction patterns, it is observed that the films have cubic structure with lattice parameters varying with boron concentration. The morphologies of the films were examined by using scanning electron microscopy, and the grain sizes were measured to be around 30-50 nm. Optical measurements show that the band gap energies of the films first decrease then increase with increasing boron concentration. The resistivities of the films were determined by four point probe method, and the changes in resistivity with boron concentration were investigated.

  12. Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO{sub 2} by capacitance voltage measurement on inverted metal oxide semiconductor structure

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Tian, E-mail: tianz@student.unsw.edu.au; Puthen-Veettil, Binesh; Wu, Lingfeng; Jia, Xuguang; Lin, Ziyun; Yang, Terry Chien-Jen; Conibeer, Gavin; Perez-Wurfl, Ivan [Australian Centre for Advanced Photovoltaics, UNSW Australia, Kensington, New South Wales 2052 (Australia)

    2015-10-21

    We investigate the Capacitance-Voltage (CV) measurement to study the electrically active boron doping in Si nanocrystals (ncSi) embedded in SiO{sub 2}. The ncSi thin films with high resistivity (200–400 Ω cm) can be measured by using an inverted metal oxide semiconductor (MOS) structure (Al/ncSi (B)/SiO{sub 2}/Si). This device structure eliminates the complications from the effects of lateral current flow and the high sheet resistance in standard lateral MOS structures. The characteristic MOS CV curves observed are consistent with the effective p-type doping. The CV modeling method is presented and used to evaluate the electrically active doping concentration. We find that the highly boron doped ncSi films have electrically active doping of 10{sup 18}–10{sup 19 }cm{sup −3} despite their high resistivity. The saturation of doping at about 1.4 × 10{sup 19 }cm{sup −3} and the low doping efficiency less than 5% are observed and discussed. The calculated effective mobility is in the order of 10{sup −3} cm{sup 2}/V s, indicating strong impurity/defect scattering effect that hinders carriers transport.

  13. Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure

    International Nuclear Information System (INIS)

    We investigate the Capacitance-Voltage (CV) measurement to study the electrically active boron doping in Si nanocrystals (ncSi) embedded in SiO2. The ncSi thin films with high resistivity (200–400 Ω cm) can be measured by using an inverted metal oxide semiconductor (MOS) structure (Al/ncSi (B)/SiO2/Si). This device structure eliminates the complications from the effects of lateral current flow and the high sheet resistance in standard lateral MOS structures. The characteristic MOS CV curves observed are consistent with the effective p-type doping. The CV modeling method is presented and used to evaluate the electrically active doping concentration. We find that the highly boron doped ncSi films have electrically active doping of 1018–1019 cm−3 despite their high resistivity. The saturation of doping at about 1.4 × 1019 cm−3 and the low doping efficiency less than 5% are observed and discussed. The calculated effective mobility is in the order of 10−3 cm2/V s, indicating strong impurity/defect scattering effect that hinders carriers transport

  14. Investigation on cubic boron nitride crystals doped with Si by high temperature thermal diffusion

    Science.gov (United States)

    Li, Xinlu; Feng, Shuang; Liu, Xiuhuan; Hou, Lixin; Gao, Yanjun; Wang, Qi; Liu, Nian; Zhang, Hai; Chen, Zhanguo; Zheng, Jie; Jia, Gang

    2014-07-01

    The method of high temperature thermal diffusion was successfully applied for doping Si impurities into cubic boron nitride (cBN) crystals. X-ray photoelectron spectra (XPS) and the current-voltage (I-V) characteristics at different temperatures were respectively used for analyzing the chemical states and the activation energy of Si impurity in cBN. According to the XPS results, Si impurities mainly replace B atoms bonding with the adjacent N atoms and become donors in cBN. Without surface cleaning, there are a lot of C and O contaminations on the surface of cBN, so a small quantity of C-Si and Si-N-O bonds also exist at the surface of cBN. Most Si impurities distribute in the shallow layer underneath the surface of cBN. Based on the electric measurement, Si impurities in cBN usually have the activation energy beyond 0.4 eV, and they can only be slightly ionized at room temperature, therefore the resistivity of Si-doped cBN is still high, and the space charge limited current becomes the main conductive mechanism in cBN. However, the conductivity of Si-doped cBN can rapidly increase with the temperature. In addition, the activation energy and the concentration of Si impurity in cBN can be affected by the temperature and the time of thermal diffusion, which needs to be verified further.

  15. Effects of domain size on x-ray absorption spectra of boron nitride doped graphenes

    Science.gov (United States)

    Li, Xin; Hua, Weijie; Wang, Bo-Yao; Pong, Way-Faung; Glans, Per-Anders; Guo, Jinghua; Luo, Yi

    2016-08-01

    Doping is an efficient way to open the zero band gap of graphene. The control of the dopant domain size allows us to tailor the electronic structure and the properties of the graphene. We have studied the electronic structure of boron nitride doped graphenes with different domain sizes by simulating their near-edge X-ray absorption fine structure (NEXAFS) spectra at the N K-edge. Six different doping configurations (five quantum dot type and one phase-separated zigzag-edged type) were chosen, and N K-edge NEXAFS spectra were calculated with large truncated cluster models by using the density functional theory with hybrid functional and the equivalent core hole approximation. The opening of the band gap as a function of the domain size is revealed. We found that nitrogens in the dopant boundary contribute a weaker, red-shifted π* peak in the spectra as compared to those in the dopant domain center. The shift is related to the fact that these interfacial nitrogens dominate the lowest conduction band of the system. Upon increasing the domain size, the ratio of interfacial atom decreases, which leads to a blue shift of the π* peak in the total NEXAFS spectra. The spectral evolution agrees well with experiments measured at different BN-dopant concentrations and approaches to that of a pristine h-BN sheet.

  16. Electronic and physico-chemical properties of nanometric boron delta-doped diamond structures

    Energy Technology Data Exchange (ETDEWEB)

    Chicot, G., E-mail: gauthier.chicot@neel.cnrs.fr; Fiori, A.; Tran Thi, T. N.; Bousquet, J.; Delahaye, J.; Grenet, T.; Eon, D.; Omnès, F.; Bustarret, E. [Université Grenoble Alpes, Institut NEEL, 38042 Grenoble (France); CNRS, Institut NEEL, 38042 Grenoble (France); Volpe, P. N.; Tranchant, N.; Mer-Calfati, C.; Arnault, J. C. [CEA, LIST, Diamond Sensors Laboratory, 91191 Gif-sur-Yvette (France); Gerbedoen, J. C.; Soltani, A.; De Jaeger, J. C. [IEMN, UMR-CNRS 8520, Avenue Poincaré, Université de Lille 1, 59652 Villeneuve d' Ascq (France); Alegre, M. P.; Piñero, J. C.; Araújo, D. [Dpto Ciencia de los Materiales, Facultad de Ciencias, Universidad de Cádiz, 11510 Puerto Real (Cádiz) (Spain); Jomard, F. [Groupe d' Étude de la Matière Condensée (GEMaC), UMR 8635 du CNRS, UVSQ, 45 Avenue des États-Unis, 78035 Versailles Cedex (France); and others

    2014-08-28

    Heavily boron doped diamond epilayers with thicknesses ranging from 40 to less than 2 nm and buried between nominally undoped thicker layers have been grown in two different reactors. Two types of [100]-oriented single crystal diamond substrates were used after being characterized by X-ray white beam topography. The chemical composition and thickness of these so-called delta-doped structures have been studied by secondary ion mass spectrometry, transmission electron microscopy, and spectroscopic ellipsometry. Temperature-dependent Hall effect and four probe resistivity measurements have been performed on mesa-patterned Hall bars. The temperature dependence of the hole sheet carrier density and mobility has been investigated over a broad temperature range (6 K < T < 450 K). Depending on the sample, metallic or non-metallic behavior was observed. A hopping conduction mechanism with an anomalous hopping exponent was detected in the non-metallic samples. All metallic delta-doped layers exhibited the same mobility value, around 3.6 ± 0.8 cm{sup 2}/Vs, independently of the layer thickness and the substrate type. Comparison with previously published data and theoretical calculations showed that scattering by ionized impurities explained only partially this low common value. None of the delta-layers showed any sign of confinement-induced mobility enhancement, even for thicknesses lower than 2 nm.

  17. Boron Doped Multi-walled Carbon Nanotubes as Catalysts for Oxygen Reduction Reaction and Oxygen Evolution Reactionin in Alkaline Media

    International Nuclear Information System (INIS)

    The boron doped multi-walled carbon nanotubes (B-MWCNTs) were synthesized by thermal annealing multi-walled carbon nanotubes (MWCNTs) in the presence of boric acid. The transmission electron microscopy (TEM) and X-ray diffraction (XRD) results revealed that the structure of MWCNTs does not be destroyed during the doping process, and X-ray photoelectron spectroscopy (XPS) analysis demonstrated the boron atoms were successfully doped in the structure of MWCNTs. The electrocatalytic properties of B-MWCNTs are characterized by rotating disk electrode (RDE) methods. The results demonstrated that the B-MWCNTs catalyzed oxygen reduction reaction (ORR) in alkaline media by a 2 + 2 electron pathway and it showed good catalytic activity for oxygen evolution reaction (OER) as well

  18. Science Letters:Development of supported boron-doping TiO2 catalysts by chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    In this study, supported nonmetal (boron) doping TiO2 coating photocatalysts were prepared by chemical vapor deposition (CVD) to enhance the activity under visible light irradiation and avoid the recovering of TiO2. Boron atoms were successfully doped into the lattice of TiO2 through CVD, as evidenced from XPS analysis. B-doped TiO2 coating catalysts showed drastic and strong absorption in the visible light range with a red shift in the band gap transition. This novel B-TiO2 coating photocatalyst showed higher photocatalytic activity in methyl orange degradation under visible light irradiation than that of the pure TiO2 photocatalyst.

  19. Evaluation of freestanding boron-doped diamond grown by chemical vapour deposition as substrates for vertical power electronic devices

    Energy Technology Data Exchange (ETDEWEB)

    Issaoui, R.; Achard, J.; Tallaire, A.; Silva, F.; Gicquel, A. [LSPM-CNRS (formerly LIMHP), Universite Paris 13, 99, Avenue Jean-Baptiste Clement, 93430 Villetaneuse (France); Bisaro, R.; Servet, B.; Garry, G. [Thales Research and Technology France, Campus de Polytechnique, 1 Avenue Augustin Fresnel, F-91767 Palaiseau Cedex (France); Barjon, J. [GEMaC-CNRS, Universite de Versailles Saint Quentin Batiment Fermat, 45 Avenue des Etats-Unis, 78035 Versailles Cedex (France)

    2012-03-19

    In this study, 4 x 4 mm{sup 2} freestanding boron-doped diamond single crystals with thickness up to 260 {mu}m have been fabricated by plasma assisted chemical vapour deposition. The boron concentrations measured by secondary ion mass spectroscopy were 10{sup 18} to 10{sup 20} cm{sup -3} which is in a good agreement with the values calculated from Fourier transform infrared spectroscopy analysis, thus indicating that almost all incorporated boron is electrically active. The dependence of lattice parameters and crystal mosaicity on boron concentrations have also been extracted from high resolution x-ray diffraction experiments on (004) planes. The widths of x-ray rocking curves have globally shown the high quality of the material despite a substantial broadening of the peak, indicating a decrease of structural quality with increasing boron doping levels. Finally, the suitability of these crystals for the development of vertical power electronic devices has been confirmed by four-point probe measurements from which electrical resistivities as low as 0.26 {Omega} cm have been obtained.

  20. Evaluation of freestanding boron-doped diamond grown by chemical vapour deposition as substrates for vertical power electronic devices

    International Nuclear Information System (INIS)

    In this study, 4 x 4 mm2 freestanding boron-doped diamond single crystals with thickness up to 260 μm have been fabricated by plasma assisted chemical vapour deposition. The boron concentrations measured by secondary ion mass spectroscopy were 1018 to 1020 cm-3 which is in a good agreement with the values calculated from Fourier transform infrared spectroscopy analysis, thus indicating that almost all incorporated boron is electrically active. The dependence of lattice parameters and crystal mosaicity on boron concentrations have also been extracted from high resolution x-ray diffraction experiments on (004) planes. The widths of x-ray rocking curves have globally shown the high quality of the material despite a substantial broadening of the peak, indicating a decrease of structural quality with increasing boron doping levels. Finally, the suitability of these crystals for the development of vertical power electronic devices has been confirmed by four-point probe measurements from which electrical resistivities as low as 0.26 Ω cm have been obtained.

  1. Evaluation of freestanding boron-doped diamond grown by chemical vapour deposition as substrates for vertical power electronic devices

    Science.gov (United States)

    Issaoui, R.; Achard, J.; Tallaire, A.; Silva, F.; Gicquel, A.; Bisaro, R.; Servet, B.; Garry, G.; Barjon, J.

    2012-03-01

    In this study, 4 × 4 mm2 freestanding boron-doped diamond single crystals with thickness up to 260 μm have been fabricated by plasma assisted chemical vapour deposition. The boron concentrations measured by secondary ion mass spectroscopy were 1018 to 1020 cm-3 which is in a good agreement with the values calculated from Fourier transform infrared spectroscopy analysis, thus indicating that almost all incorporated boron is electrically active. The dependence of lattice parameters and crystal mosaicity on boron concentrations have also been extracted from high resolution x-ray diffraction experiments on (004) planes. The widths of x-ray rocking curves have globally shown the high quality of the material despite a substantial broadening of the peak, indicating a decrease of structural quality with increasing boron doping levels. Finally, the suitability of these crystals for the development of vertical power electronic devices has been confirmed by four-point probe measurements from which electrical resistivities as low as 0.26 Ω cm have been obtained.

  2. Domestic and Industrial Water Disinfection Using Boron-Doped Diamond Electrodes

    Science.gov (United States)

    Rychen, Philippe; Provent, Christophe; Pupunat, Laurent; Hermant, Nicolas

    This chapter first describes main properties and manufacturing process (production using HF-CVD, quality-control measurements, etc.) of diamond electrodes and more specifically boron-doped diamond (BDD) electrodes. Their exceptional properties make such electrodes particularly suited for many disinfection applications as thanks to their wide working potential window and their high anodic potential, they allow generating a mixture of powerful oxidizing species mainly based on active oxygen and peroxides. Such mixture of disinfecting agents is far more efficient than conventional chemical or physical known techniques. Their efficiency was tested against numerous microorganisms and then proved to be greater than conventional methods. All bacteria and viruses tested up to date were inactivated 3-5 times faster with a treatment based on with BDD electrodes and the DiaCellⓇ technology than with other techniques. Several applications, either industrial or private (wellness and home use), are discussed with a focus on the dedicated products and the main technology advantages.

  3. Excitonic luminescence of SiGe/Si quantum wells δ-doped with boron

    Energy Technology Data Exchange (ETDEWEB)

    Bagaev, V. S.; Nikolaev, S. N.; Onishchenko, E. E.; Pruchkina, A. A. [P.N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow (Russian Federation); Krivobok, V. S., E-mail: krivobok@lebedev.ru [P.N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow (Russian Federation); Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow Region (Russian Federation); Novikov, A. V. [Institute for Physics of Microstructures Russian Academy of Sciences, Nizhny Novgorod (Russian Federation); Lobachevsky State University of Nizhni Novgorod, Nizhny Novgorod (Russian Federation)

    2015-05-14

    Low-temperature photoluminescence of undoped and moderately δ-doped Si{sub 1−x}Ge{sub x}/Si (x < 0.1) quantum wells has been studied. The influence of boron δ-layer on the excitonic luminescence and the luminescence caused by a dense electron plasma was demonstrated. The conditions under which the luminescence spectra of quantum wells are dominated by impurity-bound excitons (BE) have been established. Some unusual properties of these BE are explained in terms of type II band-offset in Si{sub 1−x}Ge{sub x}/Si (x < 0.1) quantum wells, which favors a spatial separation of electrons and holes. It is shown that the temperature dependence of an excitonic emission in the quantum wells allows to calculate the BE-related density of states and, thus, can be used for contactless estimation of the impurity concentration in quantum wells.

  4. Synthesis and Temperature-dependent Electrochemical Properties of Boron-doped Diamond Electrodes on Titanium

    Institute of Scientific and Technical Information of China (English)

    DU Li-li; SUN Jian-rui; CUI Hang; LI Hong-dong; CUI Tian; LIN Hai-bo

    2012-01-01

    On the sand-blasting-treated titanium(Ti) substrate,the boron-doped diamond(BDD) electrodes with a wide potential window were prepared by microwave plasma chemical vapor deposition(MPCVD).The electrochemical oxidation ratios of phenol at BDD/Ti electrodes at elevated temperatures(from 20℃ to 80℃) were examined by the chemical oxygen demand(COD) of phenol electrolyte during electrolysis.The results show that the COD removal was increased at high temperatures and the optimized temperature for enhancing the electrochemical oxidation ratio of phenol is 60 ℃.The mechanism for the temperature-dependent electrochemical oxidation ratios of phenol at the electrodes was investigated.The study.would be favorable for further improving the performance of BDD/Ti electrodes,especially working at high temperatures.

  5. Effects of the surface-adsorption of boron-doped diamond electrode on its electrochemical behavior

    Institute of Scientific and Technical Information of China (English)

    LIU Fengbin; LI Xuemin; WANG Jiadao; LIU Bing; CHEN Darong

    2006-01-01

    To elucidate the effects of the hydro- genation and oxygenation of the boron-doped diamond (BDD) electrode on its electrochemical behaviors, the surface morphologies and phases of the two surface-adsorption BDD films have been investigated and the cyclic voltammograms and AC impedance spectra have been measured at these two BDD electrodes. The results indicate that compared with the hydrogen-adsorption BDD film, oxygen-adsor- ption BDD film is less conductive, and has a larger surface roughness and a lower sp3/sp2 ratio. The oxygenated BDD film electrode possesses a wider electrochemical window, larger diamond film resistance and capacitance and a larger polarization resistance than hydrogenated BDD electrode. In addition, the effect mechanism of the surface-adsorption of BDD electrode on its electrochemical behaviors has been discussed.

  6. Electrochemical Biosensor Based on Boron-Doped Diamond Electrodes with Modified Surfaces

    Directory of Open Access Journals (Sweden)

    Yuan Yu

    2012-01-01

    Full Text Available Boron-doped diamond (BDD thin films, as one kind of electrode materials, are superior to conventional carbon-based materials including carbon paste, porous carbon, glassy carbon (GC, carbon nanotubes in terms of high stability, wide potential window, low background current, and good biocompatibility. Electrochemical biosensor based on BDD electrodes have attracted extensive interests due to the superior properties of BDD electrodes and the merits of biosensors, such as specificity, sensitivity, and fast response. Electrochemical reactions perform at the interface between electrolyte solutions and the electrodes surfaces, so the surface structures and properties of the BDD electrodes are important for electrochemical detection. In this paper, the recent advances of BDD electrodes with different surfaces including nanostructured surface and chemically modified surface, for the construction of various electrochemical biosensors, were described.

  7. Comparison of the chemical composition of boron-doped diamond surfaces upon different oxidation processes

    International Nuclear Information System (INIS)

    In spite of the high stability of polycrystalline diamond, oxidation of the hydrogenated surface is relatively easy to perform. This results in the introduction of ether (C-O-C), carbonyl (C=O) and hydroxyl (C-OH) groups on the surface. For further surface functionalization, it is important to quantify the presence of each group on the diamond surface when different oxidation processes are used. In this paper, we investigate the composition of oxidized boron-doped diamond surfaces using X-ray photoelectron spectroscopy (XPS) when electrochemical, photochemical or oxygen plasma methods were employed to introduce oxygen functionalities on as-deposited diamond interfaces. Cyclic voltammetry and C-V measurements were additionally performed to identify more clearly the formation of C-OH, C-O-C and/or C=O functions.

  8. Boron-Doped Nanocrystalline Diamond Electrodes for Neural Interfaces: In vivo Biocompatibility Evaluation.

    Science.gov (United States)

    Alcaide, María; Taylor, Andrew; Fjorback, Morten; Zachar, Vladimir; Pennisi, Cristian P

    2016-01-01

    Boron-doped nanocrystalline diamond (BDD) electrodes have recently attracted attention as materials for neural electrodes due to their superior physical and electrochemical properties, however their biocompatibility remains largely unexplored. In this work, we aim to investigate the in vivo biocompatibility of BDD electrodes in relation to conventional titanium nitride (TiN) electrodes using a rat subcutaneous implantation model. High quality BDD films were synthesized on electrodes intended for use as an implantable neurostimulation device. After implantation for 2 and 4 weeks, tissue sections adjacent to the electrodes were obtained for histological analysis. Both types of implants were contained in a thin fibrous encapsulation layer, the thickness of which decreased with time. Although the level of neovascularization around the implants was similar, BDD electrodes elicited significantly thinner fibrous capsules and a milder inflammatory reaction at both time points. These results suggest that BDD films may constitute an appropriate material to support stable performance of implantable neural electrodes over time. PMID:27013949

  9. Boron-doped nanocrystalline diamond electrodes for neural interfaces: In vivo biocompatibility evaluation

    Directory of Open Access Journals (Sweden)

    María eAlcaide

    2016-03-01

    Full Text Available Boron-doped nanocrystalline diamond (BDD electrodes have recently attracted attention as materials for neural electrodes due to their superior physical and electrochemical properties, however their biocompatibility remains largely unexplored. In this work, we aim to investigate the in vivo biocompatibility of BDD electrodes in relation to conventional titanium nitride (TiN electrodes using a rat subcutaneous implantation model. High quality BDD films were synthesized on electrodes intended for use as an implantable neurostimulation device. After implantation for 2 and 4 weeks, tissue sections adjacent to the electrodes were obtained for histological analysis. Both types of implants were contained in a thin fibrous encapsulation layer, the thickness of which decreased with time. Although the level of neovascularization around the implants was similar, BDD electrodes elicited significantly thinner fibrous capsules and a milder inflammatory reaction at both time points. These results suggest that BDD films may constitute an appropriate material to support stable performance of implantable neural electrodes over time.

  10. Electrochemical and morphological characterization of gold nanoparticles deposited on boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Limat, Meriadec; El Roustom, Bahaa [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Chemical Sciences and Engineering, CH-1015 Lausanne (Switzerland); Jotterand, Henri [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Physics of the Complex Matter, CH-1015 Lausanne (Switzerland); Foti, Gyoergy [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Chemical Sciences and Engineering, CH-1015 Lausanne (Switzerland)], E-mail: gyorgy.foti@epfl.ch; Comninellis, Christos [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Chemical Sciences and Engineering, CH-1015 Lausanne (Switzerland)

    2009-03-30

    A novel two-step method was employed to synthesize gold nanoparticles dispersed on boron-doped diamond (BDD) electrode. It consisted of sputter deposition at ambient temperature of maximum 15 equivalent monolayers of gold, followed by a heat treatment in air at 600 deg. C. Gold nanoparticles with an average diameter between 7 and 30 nm could be prepared by this method on polycrystalline BDD film electrode. The obtained Au/BDD composite electrode appeared stable under conditions of electrochemical characterization performed using ferri-/ferrocyanide and benzoquinone/hydroquinone redox couples in acidic medium. The electrochemical behavior of Au/BDD was compared to that of bulk Au and BDD electrodes. Finally, the Au/BDD composite electrode was regarded as an array of Au microelectrodes dispersed on BDD substrate.

  11. Covalent modification of boron-doped diamond electrodes with an imidazolium-based ionic liquid

    Energy Technology Data Exchange (ETDEWEB)

    Wang Mei [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France); School of Materials Science and Engineering, Shandong University, 19723 Jingshi Road, Jinan, Shandong Province (China); Schneider, Amene [Austrian Centre of Competence for Tribology, Viktor Kaplan Strasse 2, 2700, Wiener Neustadt (Austria); Niedziolka-Joensson, Joanna; Marcon, Lionel [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France); Ghodbane, Slimane; Steinmueller-Nethl, Doris [Rho-BeSt Coating GmbH, Exlgasse 20a, 6020 Innsbruck (Austria); Li Musen [School of Materials Science and Engineering, Shandong University, 19723 Jingshi Road, Jinan, Shandong Province (China); Boukherroub, Rabah [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France); Szunerits, Sabine, E-mail: sabine.szunerits@iri.univ-lille1.f [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France)

    2010-02-01

    An ionic liquid (IL, 1-(methylcarboxylic acid)-3-octylimidazolium-bis (trifluoromethylsulfonyl)imide) was covalently coupled onto a boron-doped diamond (BDD) surface through an esterification reaction. The resulting surface was characterized by X-ray photoelectron spectroscopy, water contact angle and electrochemical measurements. Selective electron transfer towards positively and negatively charged redox species was recorded. While the presence of Fe(CN){sub 6}{sup 4-} could be detected on the IL-modified BDD interface, no surface-immobilized Ru(NH{sub 3}){sub 6}{sup 3+} was recorded. The IL-modified BDD electrode showed in addition changes in surface wettability when immersed into aqueous solution containing different anions.

  12. Preparation and reactivity of carboxylic acid-terminated boron-doped diamond electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Niedziolka-Joensson, Joanna [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France); Boland, Susan; Leech, Donal [School of Chemistry, National University of Irland, Galway (Ireland); Boukherroub, Rabah [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France); Szunerits, Sabine, E-mail: sabine.szunerits@iri.univ-lille1.f [Institut de Recherche Interdisciplinaire (IRI, USR 3078), Parc de la Haute Borne, 50 Avenue de Halley, BP 70478, 59658 Villeneuve d' Ascq (France); Institut d' Electronique, de Microelectronique et de Nanotechnologie (IEMN, UMR 8520), Cite Scientifique, Avenue Poincare, BP 60069, 59652 Villeneuve d' Ascq (France)

    2010-01-01

    The paper reports on the formation of carboxy-terminated boron-doped diamond (BDD) electrodes. The carboxylic acid termination was prepared in a controlled way by reacting photochemically oxidized BDD with succinic anhydride. The resulting interface was readily employed for the linking of an amine-terminated ligand such as an osmium complex bearing an amine terminal group. The interfaces were characterized using X-ray photoelectron spectroscopy (XPS) and cyclic voltammetry (CV). Contact angle measurements were used to follow the changes in surface wetting properties due to surface functionalization. The chemical reactivity of the carboxyl-terminated BDD was investigated by covalent coupling of the acid groups to an amine-terminated osmium complex.

  13. Neutral and charged boron-doped fullerenes for CO2 adsorption

    Directory of Open Access Journals (Sweden)

    Suchitra W. de Silva

    2014-04-01

    Full Text Available Recently, the capture and storage of CO2 have attracted research interest as a strategy to reduce the global emissions of greenhouse gases. It is crucial to find suitable materials to achieve an efficient CO2 capture. Here we report our study of CO2 adsorption on boron-doped C60 fullerene in the neutral state and in the 1e−-charged state. We use first principle density functional calculations to simulate the CO2 adsorption. The results show that CO2 can form weak interactions with the BC59 cage in its neutral state and the interactions can be enhanced significantly by introducing an extra electron to the system.

  14. Benzene Oxidation on Boron-Doped Diamond Electrode: Electrochemical-Impedance Study of Adsorption Effects

    Directory of Open Access Journals (Sweden)

    Yuri Pleskov

    2012-01-01

    Full Text Available Benzene oxidation at a boron-doped diamond anode in 0.5 M K2SO4 aqueous solution is studied by cyclic voltammetry and electrochemical impedance spectroscopy. It is shown by measurements of differential capacitance and anodic current that in the ideal-polarizability potential region benzene either is not adsorbed at the diamond electrode or the benzene adsorption does not affect its capacitance. At more positive potentials, the adsorption of some intermediate of the benzene oxidation occurs at the electrode. The intermediate partially blocks the electrode surface and lowers the anodic current. The very fact of the electrode surface blocking is reflected in the complex-plane presentation of the impedance-potential plots.

  15. Boron doped nanostructure ZnO films deposited by ultrasonic spray pyrolysis

    International Nuclear Information System (INIS)

    Highlights: • Nanostructure undoped and boron doped ZnO films were deposited by USP technique. • Influences of doping on the surface and optical properties of the ZnO films were investigated. • XRD spectra of the films exhibited a variation in crystalline quality depending on the B content. - Abstract: ZnO is an II–VI compound semiconductor with a wide direct band gap of 3.3 eV at room temperature. Doped with group III elements (B, Al or Ga), it becomes an attractive candidate to replace tin oxide (SnO2) or indium tin oxide (ITO) as transparent conducting electrodes in solar cell devices and flat panel display due to competitive electrical and optical properties. In this work, ZnO and boron doped ZnO (ZnO:B) films have been deposited onto glass substrates at 350 ± 5 °C by a cost-efficient ultrasonic spray pyrolysis technique. The optical, structural, morphological and electrical properties of nanostructure undoped and ZnO:B films have been investigated. Electrical resistivity of films has been analyzed by four-probe technique. Optical properties and thicknesses of the films have been examined in the wavelength range 1200–1600 nm by using spectroscopic ellipsometry (SE) measurements. The optical constants (refractive index (n) and extinction coefficient (k)) and the thicknesses of the films have been fitted according to Cauchy model. The optical method has been used to determine the band gap value of the films. Transmission spectra have been taken by UV spectrophotometer. It is found that both ZnO and ZnO:B films have high average optical transmission (≥80%). X-ray diffraction (XRD) patterns indicate that the obtained ZnO has a hexagonal wurtzite type structure. The morphological properties of the films were studied by atomic force microscopy (AFM). The surface morphology of the nanostructure films is found to depend on the concentration of B. As a result, ZnO:B films are promising contender for their potential use as transparent window layer and

  16. Boron doped nanostructure ZnO films deposited by ultrasonic spray pyrolysis

    Energy Technology Data Exchange (ETDEWEB)

    Karakaya, Seniye, E-mail: seniyek@ogu.edu.tr; Ozbas, Omer

    2015-02-15

    Highlights: • Nanostructure undoped and boron doped ZnO films were deposited by USP technique. • Influences of doping on the surface and optical properties of the ZnO films were investigated. • XRD spectra of the films exhibited a variation in crystalline quality depending on the B content. - Abstract: ZnO is an II–VI compound semiconductor with a wide direct band gap of 3.3 eV at room temperature. Doped with group III elements (B, Al or Ga), it becomes an attractive candidate to replace tin oxide (SnO{sub 2}) or indium tin oxide (ITO) as transparent conducting electrodes in solar cell devices and flat panel display due to competitive electrical and optical properties. In this work, ZnO and boron doped ZnO (ZnO:B) films have been deposited onto glass substrates at 350 ± 5 °C by a cost-efficient ultrasonic spray pyrolysis technique. The optical, structural, morphological and electrical properties of nanostructure undoped and ZnO:B films have been investigated. Electrical resistivity of films has been analyzed by four-probe technique. Optical properties and thicknesses of the films have been examined in the wavelength range 1200–1600 nm by using spectroscopic ellipsometry (SE) measurements. The optical constants (refractive index (n) and extinction coefficient (k)) and the thicknesses of the films have been fitted according to Cauchy model. The optical method has been used to determine the band gap value of the films. Transmission spectra have been taken by UV spectrophotometer. It is found that both ZnO and ZnO:B films have high average optical transmission (≥80%). X-ray diffraction (XRD) patterns indicate that the obtained ZnO has a hexagonal wurtzite type structure. The morphological properties of the films were studied by atomic force microscopy (AFM). The surface morphology of the nanostructure films is found to depend on the concentration of B. As a result, ZnO:B films are promising contender for their potential use as transparent window layer and

  17. Synthesis and Antimicrobial Activity of Boron-doped Titania Nano-materials

    Institute of Scientific and Technical Information of China (English)

    王昱征; 薛向欣; 杨合

    2014-01-01

    Antibacterial activity of boron-doped TiO2 (B/TiO2) nano-materials under visible light irradiation and in the dark was investigated. A simple sol-gel method was used to synthesize TiO2 nano-materials. X-ray diffraction pattern of B/TiO2 nano-materials represents the diffraction peaks relating to the crystal planes of TiO2 (anatase and rutile). X-ray photoelectron spectroscopy result shows that part of boron ions incorporates into TiO2 lattice to form a possible chemical environment like Ti-O-B and the rest exist in the form of B2O3. The study on antibacterial effect of B/TiO2 nano-materials on fungal Candida albicans (ATCC10231), Gram-negative Escherichia coli (ATCC25922) and Gram-positive Staphylococcus aureus (ATCC6538) shows that the antibacterial action is more significant on Candida albicans than on Escherichia coli and Staphylococcus aureus. Under visible light irradiation, the antibacterial activity is superior to that in the dark.

  18. Boron-doped diamond anodic oxidation of ethidium bromide: Process optimization by response surface methodology

    International Nuclear Information System (INIS)

    Highlights: ► Boron-doped diamond was used to degrade ethidium bromide. ► The process was optimized by a central composite rotatable design coupled with response surface methodology. ► Applied current is proved to be the most significant variable. ► A possible reaction sequence involving all the detected byproducts was proposed. - Abstract: The degradation of ethidium bromide (EtBr), a DNA intercalating pollutant, had been studied by anodic oxidation on boron-doped diamond (BDD) electrode under galvanostatic conditions. A central composite rotatable design coupled with response surface methodology was implemented to optimize the various operating parameters involved, among initial pH, flow rate, applied current and supporting electrolyte concentration, on the treatment efficiency; the latter was assessed in terms of color removal, COD removal, specific energy consumption and general current efficiency. Of the four parameters involved, applied current had a considerable effect on all the response factors. Optimum EtBr degradation was achieved by applying a current of 0.90 A, 9.0 mM Na2SO4, flow rate of 400 ml min−1 and pH 6.2 at 60 min of electrolysis, being reduced color by 80.2% and COD by 29.7%, with an energy consumption of 398.32 kW h (kg COD)−1 and a general current efficiency of 10.1%. Under these optimized conditions, EtBr decays followed pseudo first-order kinetics. Moreover, HPLC analysis of the BDD-treated solution allowed the detection of a number of reaction intermediates, and a possible reaction sequence involving all the detected byproducts was proposed for the electrochemical oxidation of EtBr on BDD anode.

  19. Electroanalytical determination of estriol hormone using a boron-doped diamond electrode.

    Science.gov (United States)

    Santos, Keliana D; Braga, Otoniel C; Vieira, Iolanda C; Spinelli, Almir

    2010-03-15

    A boron-doped diamond (BDD) electrode was used for the electroanalytical determination of estriol hormone in a pharmaceutical product and a urine sample taken during pregnancy by square-wave voltammetry. The optimized experimental conditions were: (1) a supporting electrolyte solution of NaOH at a pH of 12.0, and (2) a frequency of 20 Hz, a pulse height of 30 mV and a scan increment of 2 mV (for the square-wave parameters). The analytical curve was linear in the concentration range of 2.0 x 10(-7) to 2.0 x 10(-5) mol L(-1) (r=0.9994), with a detection limit of 1.7 x 10(-7) mol L(-1) and quantification limit of 8.5 x 10(-7) mol L(-1). Recoveries of estriol were in the range of 98.6-101.0%, for the pharmaceutical sample, and 100.2-103.4% for the urine sample, indicating no significant matrix interference effects on the analytical results. The accuracy of the electroanalytical methodology proposed was compared to that of the radioimmunoassay method. The values for the relative error between the proposed and standard methods were -7.29% for the determination of estriol in the commercial product and -4.98% in a urine sample taken during pregnancy. The results obtained suggest a reliable and interesting alternative method for electroanalytical determination of estriol in pharmaceutical products and urine samples taken during pregnancy using a boron-doped diamond electrode.

  20. Friction and Wear Performance of Boron Doped, Undoped Microcrystalline and Fine Grained Composite Diamond Films

    Institute of Scientific and Technical Information of China (English)

    WANG Xinchang; WANG Liang; SHEN Bin; SUN Fanghong

    2015-01-01

    Chemical vapor deposition (CVD) diamond films have attracted more attentions due to their excellent mechanical properties. Whereas as-fabricated traditional diamond films in the previous studies don’t have enough adhesion or surface smoothness, which seriously impact their friction and wear performance, and thus limit their applications under extremely harsh conditions. A boron doped, undoped microcrystalline and fine grained composite diamond (BD-UM-FGCD) film is fabricated by a three-step method adopting hot filament CVD (HFCVD) method in the present study, presenting outstanding comprehensive performance, including the good adhesion between the substrate and the underlying boron doped diamond (BDD) layer, the extremely high hardness of the middle undoped microcrystalline diamond (UMCD) layer, as well as the low surface roughness and favorable polished convenience of the surface fine grained diamond (FGD) layer. The friction and wear behavior of this composite film sliding against low-carbon steel and silicon nitride balls are studied on a ball-on-plate rotational friction tester. Besides, its wear rate is further evaluated under a severer condition using an inner-hole polishing apparatus, with low-carbon steel wire as the counterpart. The test results show that the BD-UM-FGCD film performs very small friction coefficient and great friction behavior owing to its high surface smoothness, and meanwhile it also has excellent wear resistance because of the relatively high hardness of the surface FGD film and the extremely high hardness of the middle UMCD film. Moreover, under the industrial conditions for producing low-carbon steel wires, this composite film can sufficiently prolong the working lifetime of the drawing dies and improve their application effects. This research develops a novel composite diamond films owning great comprehensive properties, which have great potentials as protecting coatings on working surfaces of the wear-resistant and anti

  1. Diffusion-driven precipitate growth and ripening of oxygen precipitates in boron doped silicon by dynamical x-ray diffraction

    OpenAIRE

    Will, Johannes; Gröschel, A.; Bergmann, C.; Spiecker, E.; Magerl, A.

    2014-01-01

    X-ray Pendellösung fringes from three silicon single crystals measured at 900 °C are analyzed with respect to density and size of oxygen precipitates within a diffusion-driven growth model and compared with TEM investigations. It appears that boron doped (p+) material shows a higher precipitate density and a higher strain than moderately (p-) boron crystals. In-situ diffraction reveals a diffusion-driven precipitate growth followed by a second growth regime in both materials. An interpretatio...

  2. Dibenzothiophene adsorption at boron doped carbon nanoribbons studied within density functional theory

    Energy Technology Data Exchange (ETDEWEB)

    López-Albarrán, P. [Facultad de Ingeniería en Tecnología de la Madera, Universidad Michoacana de San Nicolás de Hidalgo, Santiago Tapia 403, CP 58000, Morelia, Michoacán (Mexico); Navarro-Santos, P., E-mail: pnavarrosa@conacyt.mx [Instituto de Investigaciones Químico-Biológicas, Universidad Michoacana de San Nicolás de Hidalgo, Santiago Tapia 403, CP 58000, Morelia, Michoacán (Mexico); Garcia-Ramirez, M. A. [Research Centre for Innovation in Aeronautical Engineering, Universidad Autónoma de Nuevo León, Ciudad Universitaria, San Nicolás de los Garza, CP 66451 Nuevo León (Mexico); Ricardo-Chávez, J. L. [Instituto Potosino de Investigación Científica y Tecnológica, Camino a la Presa San José 2055, Lomas 4" asección, CP 78216, San Luis Potosí, S. L. P. (Mexico)

    2015-06-21

    The adsorption of dibenzothiophene (DBT) on bare and boron-doped armchair carbon nanoribbons (ACNRs) is being investigated in the framework of the density functional theory by implementing periodic boundary conditions that include corrections from dispersion interactions. The reactivity of the ACNRs is characterized by using the Fukui functions as well as the electrostatic potential as local descriptors. Non-covalent adsorption mechanism is found when using the local Perdew-Becke-Ernzerhof functional, regardless of the DBT orientation and adsorption location. The dispersion interactions addition is a milestone to describe the adsorption process. The charge defects introduced in small number (i.e., by doping with B atoms), within the ACNRs increases the selectivity towards sulfur mainly due to the charge depletion at B sites. The DBT magnitude in the adsorption energy shows non-covalent interactions. As a consequence, the configurations where the DBT is adsorbed on a BC{sub 3} island increase the adsorption energy compared to random B arrangements. The stability of these configurations can be explained satisfactorily in terms of dipole interactions. Nevertheless, from the charge-density difference analysis and the weak Bader charge-distribution interactions cannot be ruled out completely. This is why the electronic properties of the ribbons are analyzed in order to elucidate the key role played by the B and DBT states in the adsorbed configurations.

  3. Optical centers introduced in boron-doped synthetic diamond by near-threshold electron irradiation

    International Nuclear Information System (INIS)

    Near-threshold irradiation of B-doped synthetic diamonds has been performed using a transmission electron microscope operated at 200 kV. Both chemical vapor deposited and high-pressure high-temperature synthesized samples have been studied. The B levels were in the range 1017-1019 cm-3. After irradiation the samples were studied by low temperature (∼7 K) photoluminescence spectroscopy using various excitation wavelengths. A number of characteristic optical centers have been observed in the spectral range 500-800 nm and these centers are reviewed. Details of the properties of the optical centers have been investigated and the results are summarized. In particular, two zero-phonon lines (ZPLs) at 636 and 666 nm, formed in boron-doped diamond materials after near displacement-threshold electron radiation damage, were found to be related. The nature of this relationship is studied by laser power dependence (at different wavelengths) of their intensities over a wide temperature range. The results are interpreted in terms of a three-level model for a single optical center that involves a dipole-forbidden excited state of lower energy and a dipole-allowed state of 90 meV higher energy. Similar behavior of a further pair of ZPLs at 650 and 668 nm also formed in these materials is discussed. The spatial distribution of centers and their alteration by ultraviolet excitation was used to investigate the nature of the 636 and 666 nm centers

  4. Modeling the Microstructure Curvature of Boron-Doped Silicon in Bulk Micromachined Accelerometer

    Directory of Open Access Journals (Sweden)

    Xiaoping He

    2013-01-01

    Full Text Available Microstructure curvature, or buckling, is observed in the micromachining of silicon sensors because of the doping of impurities for realizing certain electrical and mechanical processes. This behavior can be a key source of error in inertial sensors. Therefore, identifying the factors that influence the buckling value is important in designing MEMS devices. In this study, the curvature in the proof mass of an accelerometer is modeled as a multilayered solid model. Modeling is performed according to the characteristics of the solid diffusion mechanism in the bulk-dissolved wafer process (BDWP based on the self-stopped etch technique. Moreover, the proposed multilayered solid model is established as an equivalent composite structure formed by a group of thin layers that are glued together. Each layer has a different Young’s modulus value and each undergoes different volume shrinkage strain owing to boron doping in silicon. Observations of five groups of proof mass blocks of accelerometers suggest that the theoretical model is effective in determining the buckling value of a fabricated structure.

  5. Boron doped g-C3N4 with enhanced photocatalytic UO22+ reduction performance

    Science.gov (United States)

    Lu, Changhai; Chen, Rongyue; Wu, Xi; Fan, Meifeng; Liu, Yunhai; Le, Zhanggao; Jiang, Shujuan; Song, Shaoqing

    2016-01-01

    Tuning the band gap and absorption intensity of visible-light by element doping is an attractive strategy to enhance the photocatalytic activity of semiconductor materials. Here we doped boron into g-C3N4 to construct highly efficient photocatalysts (B-g-C3N4) for the photocatalytic reduction of UO22+. Characterization and photocatalysis tests showed the band gap of B-g-C3N4 was narrowed, and the absorption intensity of visible-light was enhanced with increasing the formed N-B-C (BCN) of B-g-C3N4, which is consistent with the trend of the photocatalytic performance of B-g-C3N4. The optimized B-g-C3N4 photocatalyst with BCN content of 1.01 at.% exhibited excellent removal efficiency of UO22+ and good photocatalytic stability. Therefore, these results may lead to a new strategy for exploring the advanced photocatalysts based on the carbon nanomaterials with abundant BCN for the photocatalytic reduction of U(VI) pollutant.

  6. Electronic and physico-chemical properties of nanometric boron delta-doped diamond structures

    International Nuclear Information System (INIS)

    Heavily boron doped diamond epilayers with thicknesses ranging from 40 to less than 2 nm and buried between nominally undoped thicker layers have been grown in two different reactors. Two types of [100]-oriented single crystal diamond substrates were used after being characterized by X-ray white beam topography. The chemical composition and thickness of these so-called delta-doped structures have been studied by secondary ion mass spectrometry, transmission electron microscopy, and spectroscopic ellipsometry. Temperature-dependent Hall effect and four probe resistivity measurements have been performed on mesa-patterned Hall bars. The temperature dependence of the hole sheet carrier density and mobility has been investigated over a broad temperature range (6 K 2/Vs, independently of the layer thickness and the substrate type. Comparison with previously published data and theoretical calculations showed that scattering by ionized impurities explained only partially this low common value. None of the delta-layers showed any sign of confinement-induced mobility enhancement, even for thicknesses lower than 2 nm

  7. First-principles calculations on the structure and electronic properties of boron doping zigzag single-walled carbon nanotubes

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    Calculations have been made for single-walled zigzag(n,0) carbon nanotubes containing substitutional boron impurity atoms using ab initio density functional theory.It is found that the formation energies of these nanotubes depend on the tube diameter,as do the electronic properties,and show periodic fea-ture that results from their different π bonding structures compared to those of perfect zigzag carbon nanotubes.When more boron atoms are incorporated into a single-walled zigzag carbon nanotube,the substitutional boron atoms tend to come together to form structure of BC3 nanodomains,and B-doped tubes have striking acceptor states above the top of the valence bands.For the structure of BC3,there are two kinds of configurations with different electronic structures.

  8. Fano interference of the Raman phonon in heavily boron-doped diamond films grown by chemical vapor deposition

    International Nuclear Information System (INIS)

    A series of boron-doped polycrystalline diamond films grown by direct current and microwave plasma deposition was studied with Raman and infrared (IR) absorption spectroscopy. A Fano line shape is observed in the Raman spectra for films with a boron concentration in a narrow range near 1021 cm-3. The appearance of the Fano line shape is correlated with the disappearance of discrete electronic transitions of the boron acceptor observed in the IR spectrum and the shift of the broadened peak to lower energy. The Fano interaction is attributed to a quantum mechanical interference between the Raman phonon (0.165 eV) and transitions from the broadened impurity band to continuum states composed of excited acceptor and valence band states

  9. Analysis of laser doping of silicon using different boron dopant sources

    Energy Technology Data Exchange (ETDEWEB)

    Prathap, P., E-mail: pathiprathap@gmail.com [InESS, CNRS-UdS, Strasbourg Cedex-2 (France); National Physical Laboratory, KS Krishnan Road, New Delhi 110012 (India); Bartringer, J.; Slaoui, A. [InESS, CNRS-UdS, Strasbourg Cedex-2 (France)

    2014-05-01

    Implementation of selective emitter that decouples the requirements for front doping and metallization leads to improve the efficiency of crystalline silicon solar cells. Formation of such an efficient selective emitter using a laser beam with a suitable wavelength is an attractive method. The present work focuses on the analysis of laser doping of boron using different finite sources such as borosilicate glass (BSG) deposited by PECVD, spin-on solution and BCl{sub 3} gas source. KrF excimer laser (248 nm) was used for the selective doping. The surface dopant concentration and depth, as measured using SIMS, were controlled by variation of the laser fluence, pulse number and dopant source thickness. Depending on the type of BSG source, sheet resistance close to 20 Ω/sq was achieved at the laser fluences in the range, 2.5–5 J/cm{sup 2}. The PECVD-BSG layers with a relatively higher thickness resulted in a lower sheet resistance of 20 Ω/sq with a junction of depth of ∼1 μm at a moderate laser fluence of 2.5 J/cm{sup 2}. In the case of BSG deposited by spin-on source, a deeper junction of depth of ∼2.7 μm with a plateau profile of 1 μm was formed at a laser fluence of 3.1 J/cm{sup 2} that resulted in a lower sheet resistance of ∼31 Ω/sq. Redistribution of the dopant with pulse repetition was observed for the BSG deposited by BCl{sub 3} gas source. Pulse repetition at relatively lower laser fluences (>threshold energy) resulted in the best electrical results in combination with a limited laser induced damage in the silicon crystal. Also, multiple laser annealing resulted in redistribution of the dopant profiles in terms of enhanced junction depth.

  10. Doped diamond electrodes on titanium substrates with controlled sp2/sp3 hybridization at different boron levels

    International Nuclear Information System (INIS)

    Doped diamond films on titanium substrate were systematically studied by controlling their sp2/sp3 hybridization as well as their boron doping levels. Samples were grown by hot filament chemical vapor deposition technique at CH4 additions of 1, 2, 6 and 10 sccm diluted in H2 for a total flow rate of 200 sccm. For each CH4 concentration four doping levels were studied. The boron source was obtained from a constant flow of 40 sccm for an additional H2 line passing through a bubbler containing the B2O3 dissolved in methanol with B/C ratios of 2000, 7000, 15,000, and 30,000 B/C ppm. Scanning electron microscopy images depicted well faceted films without cracks or delaminations. The sp2/sp3 ratio as “purity index” (PI) and the “growth tendency index” (GTI), associated to the TiC formation, were evaluated by Raman and X-ray spectra, respectively. GTI index was used in this work to analyze the competition between the diamond growth and TiC formation. It is also possible to associate the GTI index in terms of C/H ratio, since when this ratio is increased, the GTI index also increased. A constant GTI increase was observed as a function of CH4 addition for the whole range of the boron doping studied. For PI, an optimized value was observed at 6 sccm of CH4 for the doping levels higher than 2000 ppm of B/C ratio. - Highlights: • Control of experimental parameters to obtain good quality diamond films. • sp2 bond influence on the doping level of diamond films. • Systematic analysis of diamond growth process on Ti substrate

  11. Study of Electrochemical Degradation of Bromophenol Blue at Boron-doped Diamond Electrode by Using Factorial Design Analysis

    Directory of Open Access Journals (Sweden)

    Rong Fei

    2015-01-01

    Full Text Available As an ideal anode material, Boron-doped diamond (BDD has been widely applied in electro-chemical oxidation of various organic pollutants, for its unique physical and chemical properties. In this paper, the authors studied the degradation of bromophenol blue through the electrochemical anodic oxidation by using the boron-doped BDD as the anode. The effect of statistically important operating parameters on treatment per-formance, such as treatment time, flow rate, applied current and concentration of supporting electrolyte, was evaluated by employing a factorial design analysis in terms of color removal and COD removal amount. As a result, the BDD technology was approved to be highly effective in treating bromophenol blue. Moreover, the results revealed the applicability and potential of factorial design analysis in operating parameters optimization and practical engineering application of BDD technology.

  12. Investigation of catalytic activity towards oxygen reduction reaction of Pt dispersed on boron doped graphene in acid medium.

    Science.gov (United States)

    Pullamsetty, Ashok; Sundara, Ramaprabhu

    2016-10-01

    Boron doped graphene was prepared by a facile method and platinum (Pt) decoration over boron doped graphene was done in various chemical reduction methods such as sodium borohydride (NaBH4), polyol and modified polyol. X-ray diffraction analysis indicates that the synthesized catalyst particles are present in a nanocrystalline structure and transmission and scanning electron microscopy were employed to investigate the morphology and particle distribution. The electrochemical properties were investigated with the help of the rotating disk electrode (RDE) technique and cyclic voltammetry. The results show that the oxygen reduction reaction (ORR) takes place by a four-electron process. The kinetics of the ORR was evaluated using K-L and Tafel plots. The electrocatalyst obtained in modified polyol reduction method has shown the better catalytic activity compared to other two electrocatalysts. PMID:27393888

  13. Effect of Boron-Doped Diamond Interlayer on Cutting Performance of Diamond Coated Micro Drills for Graphite Machining

    Directory of Open Access Journals (Sweden)

    Zhiming Zhang

    2013-07-01

    Full Text Available Thin boron doped diamond (BDD film is deposited from trimethyl borate/acetone/hydrogen mixture on Co-cemented tungsten carbide (WC-Co micro drills by using the hot filament chemical vapor deposition (HFCVD technique. The boron peak on Raman spectrum confirms the boron incorporation in diamond film. This film is used as an interlayer for subsequent CVD of micro-crystalline diamond (MCD film. The Rockwell indentation test shows that boron doping could effectively improve the adhesive strength on substrate of as deposited thin diamond films. Dry drilling of graphite is chosen to check the multilayer (BDD + MCD film performance. For the sake of comparison, machining tests are also carried out under identical conditions using BDD and MCD coated micro drills with no interlayer. The wear mechanism of the tools has been identified and correlated with the criterion used to evaluate the tool life. The results show that the multilayer (BDD + MCD coated micro drill exhibits the longest tool life. Therefore, thin BDD interlayer is proved to be a new viable alternative and a suitable option for adherent diamond coatings on micro cutting tools.

  14. Facile Synthesis of Boron-Doped rGO as Cathode Material for High Energy Li-O2 Batteries.

    Science.gov (United States)

    Wu, Feng; Xing, Yi; Li, Li; Qian, Ji; Qu, Wenjie; Wen, Jianguo; Miller, Dean; Ye, Yusheng; Chen, Renjie; Amine, Khalil; Lu, Jun

    2016-09-14

    To improve the electrochemical performance of the high energy Li-O2 batteries, it is important to design and construct a suitable and effective oxygen-breathing cathode. Herein, a three-dimensional (3D) porous boron-doped reduction graphite oxide (B-rGO) material with a hierarchical structure has been prepared by a facile freeze-drying method. In this design, boric acid as the boron source helps to form the 3D porous structure, owing to its cross-linking and pore-forming function. This architecture facilitates the rapid oxygen diffusion and electrolyte penetration in the electrode. Meanwhile, the boron-oxygen functional groups linking to the carbon surface or edge serve as additional reaction sites to activate the ORR process. It is vital that boron atoms have been doped into the carbon lattices to greatly activate the electrons in the carbon π system, which is beneficial for fast charge under large current densities. Density functional theory calculation demonstrates that B-rGO exhibits much stronger interactions with Li5O6 clusters, so that B-rGO more effectively activates Li-O bonds to decompose Li2O2 during charge than rGO does. With B-rGO as a catalytic substrate, the Li-O2 battery achieves a high discharge capacity and excellent rate capability. Moreover, catalysts could be added into the B-rGO substrate to further lower the overpotential and enhance the cycling performance in future. PMID:27549204

  15. Boron-doped silicon film as a recombination layer in the tunnel junction of a tandem solar cell

    Institute of Scientific and Technical Information of China (English)

    Shi Mingji; Wang Zhanguo; Liu Shiyong; Peng Wenbo; Xiao Haibo; Zhang Changsha; Zeng Xiangbo

    2009-01-01

    Boron-doped hydrogenated silicon films with different gaseous doping ratios (B2H6/SiH4) were deposited in a plasma-enhanced chemical vapor deposition (PECVD) system. The microstructure of the films was investigated by atomic force microscopy (AFM) and Raman scattering spectroscopy. The electrical properties of the films were characterized by their room temperature electrical conductivity (σ) and the activation energy (Ea). The results show that with an increasing gaseous doping ratio, the silicon films transfer from a microcrystalline to an amorphous phase, and corresponding changes in the electrical properties were observed. The thin boron-doped silicon layers were fabricated as recombination layers in tunnel junctions. The measurements of the Ⅰ-Ⅴ characteristics and the transparency spectra of the junctions indicate that the best gaseous doping ratio of the recombination layer is 0.04, and the film deposited under that condition is amorphous silicon with a small amount of crystallites embedded in it. The junction with such a recombination layer has a small resistance, a nearly ohmic contact, and a negligible optical absorption.

  16. Preparation and visible-light-driven photoelectrocatalytic properties of boron-doped TiO2 nanotubes

    International Nuclear Information System (INIS)

    In the present study, chemical vapour deposition (CVD) was applied to dope boron into TiO2 nanotubes anodized Ti in C2H2O4.2H2O + NH4F electrolyte with the goal of improving the photocatalytic (PC) activity under visible light. The undoped TiO2 nanotubes had a highly self-organized structure. However, after doping through CVD, TiO2 nanotubes suffered from an observable disintegration of morphological integrity. X-ray diffraction (XRD) results confirmed that annealing temperature had an influence on the phase structure and boron impurities could retard anatase-rutile phase transition. Diffuse reflectance absorption spectra (DRS) analysis indicated that B-doped samples displayed stronger absorption in both UV and visible range. B-doped TiO2 nanotubes electrode annealed at 700 deg. C through CVD showed higher photoelectrocatalytic (PEC) efficiency in methyl orange (MO) degradation than that annealed at 400 deg. C and 550 deg. C. MO degradation was substantially enhanced with the increasing applied bias potential. Moreover, there was a synergetic effect between the electrochemical and photocatalytic processes, and the synergetic factor R reached 1.45. B-doped TiO2 nanotubes electrode showed good stability after 10 times by repeating photoelectrocatalysis of MO

  17. Biofouling resistance of boron-doped diamond neural stimulation electrodes is superior to titanium nitride electrodes in vivo

    DEFF Research Database (Denmark)

    Meijs, Suzan; Alcaide, Maria; Sørensen, Charlotte;

    2016-01-01

    OBJECTIVE: The goal of this study was to assess the electrochemical properties of boron-doped diamond (BDD) electrodes in relation to conventional titanium nitride (TiN) electrodes through in vitro and in vivo measurements. APPROACH: Electrochemical impedance spectroscopy, cyclic voltammetry and ...... electrodes possess a superior biofouling resistance, which provides significantly stable electrochemical properties both in protein solution as well as in vivo compared to TiN electrodes....

  18. Electron-phonon interaction in boron-doped silicon nanocrystals: effect of Fano interference on combined light scattering

    International Nuclear Information System (INIS)

    The arrays of the silicon nanocrystals in the boron-doped amorphous silicon films are studied by the method of the light combined scattering spectroscopy. The nanocrystals were formed in the initial amorphous films under the pulse effect of the excimer laser. The effects of the electron-phonon interaction were experimentally identified in the silicon nanocrystal/amorphous matrix heterostructure. These effects may be described within the frames of the known Fano interference model

  19. Fabrication of boron-doped carbon fibers by the decomposition of B4C and its excellent rate performance as an anode material for lithium-ion batteries

    Science.gov (United States)

    Wang, Huiqi; Ma, Canliang; Yang, Xueteng; Han, Tao; Tao, Zechao; Song, Yan; Liu, Zhanjun; Guo, Quangui; Liu, Lang

    2015-03-01

    A facile route, for the first time, was developed to fabricate boron-doped carbon fibers (BDCFs). Boron was doped into mesosphere pitch-based carbon fibers (CFs) by exposing the CFs in a vapor of boron by the decomposition of boron carbide. The microstructure of BDCFs was characterized by SEM, TEM, XRD and Raman spectroscopy. When used as anode materials for the lithium-ion batteries, BDCFs electrode exhibits an improved performance. Concretely, the specific capacity of BDCFs still had a value of over 400 mAh g-1 after 100 cycles. Moreover, BDCFs exhibits better rate capability and less hysteresis in comparison to the pristine CFs. Such enhanced lithium storage capability can be attributed to the improvement of graphitization properties and the high amount of defects induced by boron.

  20. Voltammetric method for sensitive determination of herbicide picloram in environmental and biological samples using boron-doped diamond film electrode

    International Nuclear Information System (INIS)

    The voltammetric behavior and determination of picloram, a member of a pyridine herbicide family, was for the first time investigated on a boron doped diamond film electrode using cyclic and differential pulse voltammetry. The influence of supporting electrolyte and scan rate on the current response of picloram was examined to select the optimum experimental conditions. It was found that picloram provided one well-shaped oxidation peak at very positive potential (+1.5 V vs. Ag/AgCl electrode) in strong acidic medium. At optimized differential pulse voltammetric parameters, the current response of picloram was proportionally linear in the concentration range from 0.5 to 48.07 μmol L−1 and the low limit of detection of 70 nmol L−1 as well as good repeatability (relative standard deviation of 2.6% at 10 μmol L−1 for n = 11) were obtained on unmodified boron-doped diamond film electrode. The proposed method was successfully applied in analysis of environmental (tap and natural water) and biological (human urine) samples spiked with picloram with good accuracy (relative standard deviations less than 5% for all samples, n = 5). By this way, the boron-doped diamond could introduce a green (environmentally acceptable) alternative to mercury electrodes for the monitoring of herbicides

  1. Electroanalytical investigation and determination of pefloxacin in pharmaceuticals and serum at boron-doped diamond and glassy carbon electrodes.

    Science.gov (United States)

    Uslu, Bengi; Topal, Burcu Dogan; Ozkan, Sibel A

    2008-02-15

    The anodic behavior and determination of pefloxacin on boron-doped diamond and glassy carbon electrodes were investigated using cyclic, linear sweep, differential pulse and square wave voltammetric techniques. In cyclic voltammetry, pefloxacin shows one main irreversible oxidation peak and additional one irreversible ill-defined wave depending on pH values for both electrodes. The results indicate that the process of pefloxacin is irreversible and diffusion controlled on boron-doped diamond electrode and irreversible but adsorption controlled on glassy carbon electrode. The peak current is found to be linear over the range of concentration 2x10(-6) to 2x10(-4)M in 0.5M H(2)SO(4) at about +1.20V (versus Ag/AgCl) for differential pulse and square wave voltammetric technique using boron-doped diamond electrode. The repeatability, reproducibility, precision and accuracy of the methods in all media were investigated. Selectivity, precision and accuracy of the developed methods were also checked by recovery studies. The procedures were successfully applied to the determination of the drug in pharmaceutical dosage forms and humans serum samples with good recovery results. No electroactive interferences from the excipients and endogenous substances were found in the pharmaceutical dosage forms and biological samples, respectively.

  2. Highly transparent and conducting boron doped zinc oxide films for window of Dye Sensitized Solar Cell applications

    International Nuclear Information System (INIS)

    Highlights: ► Synthesis of Boron doped ZnO (ZnO:B) films. ► Minimum of resistivity is observed to be 7.9 × 10−4 Ω cm. ► Maximum transmittance ∼91% for 450 °C annealed films. ► Applicable for window materials in Dye Sensitized Solar Cell. - Abstract: Highly transparent and conducting boron doped zinc oxide (ZnO:B) films grown by sol–gel method are reported. The annealing temperature is varied from 350 to 550 °C and doping concentration of boron is kept fixed for 0.6 at.% for all the films. At low temperature the stress in the films is compressive, which becomes tensile for the films annealed at higher temperature. A minimum resistivity of 7.9 × 10−4 Ω cm and maximum transmittance of ∼91% are observed for the film annealed at 450 °C. This could be attributed to minimum stress of films, which is further evident by the evolution of A1 and defect related Raman modes without any shifting in its position. Such kind of highly transparent and conducting ZnO:B thin film could be used as window material in Dye Sensitized Solar Cell (DSSC).

  3. Optical and electronic properties of SO2 molecule adsorbed on Si-doped (8, 0) boron nitride nanotube

    Science.gov (United States)

    Guo, Shuang-Shuang; Wei, Xiu-Mei; Zhang, Jian-Min; Zhu, Gang-Qiang; Guo, Wan-Jin

    2016-09-01

    The study of the optical properties of pristine BNNT, Si-doped BNNTs and SO2 molecule adsorption on Si-doped BNNTs is that, to our knowledge, few relevant research have ever been found. In this paper, the adsorption behaviors of Sulfur dioxide (SO2) molecule on Si-doped Boron nitride nanotubes (BNNTs) are investigated applying the first-principles calculations. The main contribution of this paper is that the foremost investigation for the optical properties of the pristine BNNT, Si-doped BNNTs and SO2 adsorption on Si-doped BNNTs. Additionally, the electronic properties and the structural properties are also presented. In our calculations of optical properties, the dielectric constant, the refractive index and the absorption coefficient are obtained. Comparing the pristine BNNT, our results indicate that, the blue-shifts (in the main peaks of the dielectric constant of SiB -BNNT and SO2-SiB -BNNT), and the red-shifts (in the main peaks of the refractive index of SiN -BNNT and SO2-SiN -BNNT) are appeared. Under these conditions, Si-doped BNNT and Si-doped BNNT with SO2 adsorption, the gaps are reduced both for the speculated optical band gaps and the electronic structure band gaps.

  4. Functionalization of boron-doped nanocrystalline diamond with N3 dye molecules.

    Science.gov (United States)

    Yeap, W S; Liu, X; Bevk, D; Pasquarelli, A; Lutsen, L; Fahlman, M; Maes, W; Haenen, K

    2014-07-01

    N3 dye molecules [cis-bis(isothiocyanato)bis(2,2'-bipyridyl-4,4'-dicarboxylato)ruthenium(II)] are covalently attached to boron-doped nanocrystalline diamond (B:NCD) thin films through a combination of coupling chemistries, i.e., diazonium, Suzuki, and EDC-NHS. X-ray and ultraviolet photoelectron spectroscopy and near-edge X-ray absorption fine structure spectroscopy are used to verify the covalent bonding of the dye on the B:NCD surface (compared to a hydrogen-terminated reference). The spectroscopic results confirm the presence of a dense N3 chromophore layer, and the positions of the frontier orbitals of the dye relative to the band edge of the B:NCD thin film are inferred as well. Proof-of-concept photoelectrochemical measurements show a strong increase in the photocurrent compared to non-dye-functionalized B:NCD films. This study opens up the possibility of applying N3-sensitized B:NCD thin films as hole conductors in dye-sensitized solar cells. PMID:24915549

  5. Mineralization of bisphenol A (BPA) by anodic oxidation with boron-doped diamond (BDD) electrode

    Energy Technology Data Exchange (ETDEWEB)

    Murugananthan, M. [Satellite Venture Business Laboratory, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)], E-mail: muruga.chem@gmail.com; Yoshihara, S. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)], E-mail: sachioy@cc.utsunomiya-u.ac.jp; Rakuma, T.; Shirakashi, T. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)

    2008-06-15

    Anodic oxidation of bisphenol A (BPA), a representative endocrine disrupting chemical, was carried out using boron-doped diamond (BDD) electrode at galvanostatic mode. The electro-oxidation behavior of BPA at BDD electrode was investigated by means of cyclic voltammetric technique. The extent of degradation and mineralization of BPA were monitored by HPLC and total organic carbon (TOC) value, respectively. The results obtained, indicate that the BPA removal at BDD depends on the applied current density (I{sub appl}), initial concentration of BPA, pH of electrolyte and supporting medium. Galvanostatic electrolysis at BDD anode cause concomitant generation of hydroxyl radical that leads to the BPA destruction. The kinetics for the BPA degradation follows a pseudo-first order reaction with a higher rate constant 12.8 x 10{sup -5} s{sup -1} for higher I{sub appl} value 35.7 mA cm{sup -2}, indicating that the oxidation reaction is limited by I{sub appl} control. Complete mineralization of BPA was achieved regardless of the variables and accordingly the mineralization current efficiency was calculated from the TOC removal measurements. Considering global oxidation process, the effect of supporting electrolytes has been discussed in terms of the electro generated inorganic oxidants. The better performance of BDD anode was proved on a comparative study with Pt and glassy carbon under similar experimental conditions. A possible reaction mechanism for BPA degradation involving three main aromatic intermediates, identified by GC-MS analysis, was proposed.

  6. Electrochemical treatment of cork boiling wastewater with a boron-doped diamond anode.

    Science.gov (United States)

    Fernandes, Annabel; Santos, Diana; Pacheco, Maria José; Ciríaco, Lurdes; Simões, Rogério; Gomes, Arlindo C; Lopes, Ana

    2015-01-01

    Anodic oxidation at a boron-doped diamond anode of cork boiling wastewater was successfully used for mineralization and biodegradability enhancement required for effluent discharge or subsequent biological treatment, respectively. The influence of the applied current density (30-70 mA/cm2) and the background electrolyte concentration (0-1.5 g/L Na2SO4) on the performance of the electrochemical oxidation was investigated. The supporting electrolyte was required to achieve conductivities that enabled anodic oxidation at the highest current intensities applied. The results indicated that pollutant removal increased with the applied current density, and after 8 h, reductions greater than 90% were achieved for COD, dissolved organic carbon, total phenols and colour. The biodegradability enhancement was from 0.13 to 0.59 and from 0.23 to 0.72 for the BOD/COD ratios with BOD of 5 and 20 days' incubation period, respectively. The tests without added electrolyte were performed at lower applied electrical charges (15 mA/cm2 or 30 V) with good organic load removal (up to 80%). For an applied current density of 30 mA/cm2, there was a minimum of electric conductivity of 1.9 mS/cm (corresponding to 0.75 g/L of Na2SO4), which minimized the specific energy consumption.

  7. DC current and AC impedance measurements on boron-doped single crystalline diamond films

    Energy Technology Data Exchange (ETDEWEB)

    Ye, Haitao; Gaudin, O.; Jackman, R.B. [Department of Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE (United Kingdom); Muret, P.; Gheeraert, E. [Laboratoire d' Etudes des Proprietes Electroniques des Solides, BP166, 38042 Grenoble Cedex 9 (France)

    2003-09-01

    In this paper, we report the first measurement of impedance on boron-doped single crystalline diamond films from 0.1 Hz to 10 MHz with the temperature ranging from -100 C up to 300 C. The Cole-Cole (Z' via Z{sup ''}) plots are well fitted to a RC parallel circuit model and the equivalent Resistance and Capacitance for the diamond films have been estimated using the Zview curve fitting. The results show only one single semicircle response at each temperature measured. It was found that the resistance decreases from 70 G{omega} at -100 C to 5 k{omega} at 300 C. The linear curve fitting from -100 C to 150 C shows the sample has an activation energy of 0.37 eV, which is consistent with the theoretical value published of this kind of material. The equivalent capacitance is maintained at the level of pF up to 300 C suggesting that no grain boundaries are being involved, as expected from a single crystal diamond. The activation energy from the dc current-temperature curves is 0.36 eV, which is consistent with the value from ac impedance. The potential of this under-used technique for diamond film analysis will be discussed. (copyright 2003 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  8. Anodic oxidation of textile dyehouse effluents on boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Tsantaki, Eleni; Velegraki, Theodora; Katsaounis, Alexandros [Department of Environmental Engineering, Technical University of Crete, Polytechneioupolis, GR-73100 Chania (Greece); Mantzavinos, Dionissios, E-mail: mantzavi@mred.tuc.gr [Department of Environmental Engineering, Technical University of Crete, Polytechneioupolis, GR-73100 Chania (Greece)

    2012-03-15

    The electrochemical oxidation of textile effluents over a boron-doped diamond anode was investigated in the present study. Experiments were conducted with a multi-component synthetic solution containing seventeen dyes and other auxiliary inorganics, as well as an actual effluent from a textile dyeing process. The effect of varying operating parameters, such as current density (4-50 mA/cm{sup 2}), electrolyte concentration (0.1-0.5 M HClO{sub 4}), initial solution pH (1-12.3) and temperature (22-43 Degree-Sign C), on process efficiency was investigated following changes in total organic carbon (TOC), chemical oxygen demand (COD) and color. Complete decolorization accompanied by significant mineralization (up to 85% depending on the conditions) could be achieved after 180 min of treatment. Performance was improved at higher electrolyte concentrations and lower pH values, while the effect of temperature was marginal. Energy consumption per unit mass of COD removed was favored at lower current densities, since energy was unnecessarily wasted to side reactions at higher densities.

  9. Microfluidic platform for environmental contaminants sensing and degradation based on boron-doped diamond electrodes.

    Science.gov (United States)

    Medina-Sánchez, Mariana; Mayorga-Martinez, CarmenC; Watanabe, Takeshi; Ivandini, TribidasariA; Honda, Yuki; Pino, Flavio; Nakata, Kazuya; Fujishima, Akira; Einaga, Yasuaki; Merkoçi, Arben

    2016-01-15

    We have developed a lab-on-a-chip (LOC) platform for electrochemical detection and degradation of the pesticide atrazine (Atz). It is based on boron-doped diamond (BDD) electrodes and a competitive magneto-enzyme immunoassay (EIA) that enables high sensitivity. To detect the enzymatic reaction, we employed a BDD electrode modified with platinum nanoparticles (PtNPs), as a highly conductive catalytic transducer. Chronoamperometry revealed a limit of detection (LOD) of 3.5 pM for atrazine, which, to the best of our knowledge, is one of the lowest value published to date. Finally, we degraded Atz in the same platform, using a bare BDD electrode that features remarkable corrosion stability, a wide potential window, and much higher O2 overvoltage as compared to conventional electrodes. These characteristics enable the electrode to produce a greater amount of HO• on the anode surface than do conventional electrodes and consequently, to destroy the pollutant more rapidly. Our new LOC platform might prove interesting as a smart system for detection and remediation of diverse pesticides and other contaminants. PMID:26339934

  10. Mineralization of bisphenol A (BPA) by anodic oxidation with boron-doped diamond (BDD) electrode

    International Nuclear Information System (INIS)

    Anodic oxidation of bisphenol A (BPA), a representative endocrine disrupting chemical, was carried out using boron-doped diamond (BDD) electrode at galvanostatic mode. The electro-oxidation behavior of BPA at BDD electrode was investigated by means of cyclic voltammetric technique. The extent of degradation and mineralization of BPA were monitored by HPLC and total organic carbon (TOC) value, respectively. The results obtained, indicate that the BPA removal at BDD depends on the applied current density (Iappl), initial concentration of BPA, pH of electrolyte and supporting medium. Galvanostatic electrolysis at BDD anode cause concomitant generation of hydroxyl radical that leads to the BPA destruction. The kinetics for the BPA degradation follows a pseudo-first order reaction with a higher rate constant 12.8 x 10-5 s-1 for higher Iappl value 35.7 mA cm-2, indicating that the oxidation reaction is limited by Iappl control. Complete mineralization of BPA was achieved regardless of the variables and accordingly the mineralization current efficiency was calculated from the TOC removal measurements. Considering global oxidation process, the effect of supporting electrolytes has been discussed in terms of the electro generated inorganic oxidants. The better performance of BDD anode was proved on a comparative study with Pt and glassy carbon under similar experimental conditions. A possible reaction mechanism for BPA degradation involving three main aromatic intermediates, identified by GC-MS analysis, was proposed

  11. Electrochemical determination of bisphenol A using a boron-doped diamond electrode

    International Nuclear Information System (INIS)

    An electrochemical method was developed for the determination of bisphenol A (BPA) at an unmodified boron-doped diamond (BDD) electrode using differential pulse voltammetry (DPV). The sensitivity of the DPV measurements was significantly improved by using a predominantly hydrogen-terminated BDD electrode obtained by a cathodic pretreatment. A highly linear analytical curve was obtained for BPA determination in the range of 0.44–5.2 μmol L−1, with quantification and detection limits of 0.71 μmol L−1 and 0.21 μmol L−1, respectively. After assuring that the results obtained with the developed DPV method did not change in the presence of possible interferents, the method was successfully applied to monitor the concentration of BPA as it was electrooxidized in a flow reactor with an Nb/BDD anode. As far as it could be verified, the proposed electroanalytical method is the first one based on the use of an unmodified electrode.

  12. Bioelectrochemical degradation of urea at platinized boron doped diamond electrodes for bioregenerative systems

    Science.gov (United States)

    Nicolau, Eduardo; González-González, Ileana; Flynn, Michael; Griebenow, Kai; Cabrera, Carlos R.

    2009-10-01

    The recovery of potable water from space mission wastewater is critical for the life support and environmental health of crew members in long-term missions. NASA estimates reveal that at manned space missions 1.91 kg/person day of urine is produced, with urea and various salts as its main components. In this research we explore the utilization of urease (EC 3.5.1.5, 15,000 U/g) along with a platinized boron doped diamond electrode (Pt-BDD) to degrade urea. Urea is directly degraded to nitrogen by the in situ utilization of the reaction products as a strategy to increase the amount of clean water in future space expeditions. The biochemical reaction of urease produces ammonia and carbon dioxide from urea. Thereafter, ammonia is electrooxidized at the interface of the Pt-BDD producing molecular nitrogen. The herein presented system has been proven to have 20% urea conversion efficiency. This research has potential applications for future long-term space missions since the reaction byproducts could be used for a biomass subsystem (in situ resource recovery), while generating electricity from the same process.

  13. Electrochemical incineration of sulfanilic acid at a boron-doped diamond anode.

    Science.gov (United States)

    El-Ghenymy, Abdellatif; Arias, Conchita; Cabot, Pere Lluís; Centellas, Francesc; Garrido, José Antonio; Rodríguez, Rosa María; Brillas, Enric

    2012-06-01

    The anodic oxidation of sulfanilic acid solutions has been studied in acidic medium using a divided cell with a boron-doped diamond (BDD) anode and a stainless steel cathode. Overall mineralization was achieved under all experimental conditions tested due to the efficient destruction of sulfanilic acid and all its by-products with hydroxyl radicals generated at the BDD anode from water oxidation. The alternative use of an undivided cell with the same electrodes gave rise to the coating of the cathode with polymeric compounds, thus preventing the complete electrochemical incineration of sulfanilic acid. The solutions treated in the anodic compartment of the divided cell were degraded at similar rate under pH regulation within the pH interval 2.0-6.0. The mineralization current efficiency was enhanced when the applied current decreased and the initial substrate concentration increased. The decay of sulfanilic acid was followed by reversed-phase HPLC, showing a pseudo first-order kinetics. Hydroquinone and p-benzoquinone were identified as aromatic intermediates by gas chromatography-mass spectrometry and/or reversed-phase HPLC. Maleic, acetic, formic, oxalic and oxamic acids were detected as generated carboxylic acids by ion-exclusion HPLC. Ionic chromatographic analysis of electrolyzed solutions revealed that the N content of sulfanilic acid was mainly released as NH(4)(+) ion and in much smaller proportion as NO(3)(-) ion.

  14. Electrochemical decolorization of dye wastewater by surface-activated boron-doped nanocrystalline diamond electrode.

    Science.gov (United States)

    Chen, Chienhung; Nurhayati, Ervin; Juang, Yaju; Huang, Chihpin

    2016-07-01

    Complex organics contained in dye wastewater are difficult to degrade and often require electrochemical advanced oxidation processes (EAOPs) to treat it. Surface activation of the electrode used in such treatment is an important factor determining the success of the process. The performance of boron-doped nanocrystalline diamond (BD-NCD) film electrode for decolorization of Acid Yellow (AY-36) azo dye with respect to the surface activation by electrochemical polarization was studied. Anodic polarization found to be more suitable as electrode pretreatment compared to cathodic one. After anodic polarization, the originally H-terminated surface of BD-NCD was changed into O-terminated, making it more hydrophilic. Due to the oxidation of surface functional groups and some portion of sp(2) carbon in the BD-NCD film during anodic polarization, the electrode was successfully being activated showing lower background current, wider potential window and considerably less surface activity compared to the non-polarized one. Consequently, electrooxidation (EO) capability of the anodically-polarized BD-NCD to degrade AY-36 dye was significantly enhanced, capable of nearly total decolorization and chemical oxygen demand (COD) removal even after several times of re-using. The BD-NCD film electrode favored acidic condition for the dye degradation; and the presence of chloride ion in the solution was found to be more advantageous than sulfate active species. PMID:27372123

  15. Direct and Simultaneous Determination of Phenol, Hydroquinone and Nitrophenol at Boron-Doped Diamond Film Electrode

    Institute of Scientific and Technical Information of China (English)

    ZHAO, Guo-Hua; TANG, Yi-Ting; LIU, Mei-Chuan; LEI, Yan-Zhu; XIAO, Xiao-E

    2007-01-01

    The electrochemical characteristics of multi-component phenolic pollutants, such as phenol (Ph), hydroquinone (HQ) and 4-nitrophenol (4-NP), were investigated on boron-doped diamond (BDD) film electrode by differential pulse voltammetry (DPV) technique. A simple and feasible platform was accordingly established for the direct and simultaneous determination of these three phenolic pollutants. Results showed that, Ph, HQ and 4-NP gave obvious oxidation peaks on BDD electrode at the potential of 1.24, 0.76 and 1.52 V, respectively. Each of them displayed good linear relationship between their oxidation peak currents and their corresponding concentrations in a rather wide range coexisting with one or two of the other phenolic pollutants. The detection limits of Ph, HQ and 4-NP were estimated to be as low as 1.82×10-6, 1.67×10-6 and 1.44×10-6mol·L-1, respectively. Therefore, a promising direct and simultaneous electrochemical determination method of multi-component phenolic pollutants in wastewater samples was constructed successfully on BDD electrode with advantages being rapid, simple, convenient, sensitive, in situ and inexpensive.

  16. Electrochemical oxidation of oxalic acid in the presence of halides at boron doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Martinez-Huitle, C.A. [University of Milan, Milan (Italy). Dept. of Analytical Chemistry]. E-mail: Carlos.Martinez@unimi.it; Ferro, S.; Battisti, A. de [University of Ferrara (Italy). Dept. of Chemistry. Lab. of Electrochemistry; Reyna, S.; Cerro-Lopez, M.; Quiroz, M.A. [Universidad de las Americas-Puebla, Puebla (Mexico). Dept. de Quimica y Biologia. Lab. de Electroquimica]. E-mail: marcoa.quiroz@udlap.mx

    2008-07-01

    Aim of this work is to discuss the electrochemical oxidation of oxalic acid (OA), analyzing the influence of NaCl and NaBr. Experiments were carried out at boron-doped diamond (BDD) electrodes, in alkaline media. BDD electrodes have a poor superficial adsorptivity so their great stability toward oxidation allows the reaction to take place with reactants and intermediates in a non-adsorbed state. The process is significantly accelerated by the presence of a halogen salt in solution; interestingly, the mediated process does not depend on applied current density. Based on the results, bromide was selected as a suitable mediator during OA oxidation at BDD. Br{sup -} primarily acts in the volume of the solution, with the formation of strong oxidants; while Cl{sup -} action has shown lower improvements in the OA oxidation rate at BDD respect to the results reported using Pt electrode. Finally, the parameters of removal efficiency and energy consumption for the electrochemical incineration of OA were calculated. (author)

  17. Direct electrochemistry of blue copper proteins at boron-doped diamond electrodes

    Energy Technology Data Exchange (ETDEWEB)

    McEvoy, James P. [Department of Chemistry, University of Oxford, Chemistry Research Laboratory, Mansfield Road, Oxford, OX1 3TA (United Kingdom); Foord, John S. [Department of Chemistry, University of Oxford, Chemistry Research Laboratory, Mansfield Road, Oxford, OX1 3TA (United Kingdom)]. E-mail: john.foord@chem.ox.ac.uk

    2005-05-05

    Boron-doped diamond (BDD) is a promising electrode material for use in the spectro-electrochemical study of redox proteins and, in this investigation, cyclic voltammetry was used to obtain quasi-reversible electrochemical responses from two blue copper proteins, parsley plastocyanin and azurin from Pseudomonas aeruginosa. No voltammetry was observed at the virgin electrodes, but signals were observed if the electrodes were anodised, or abraded with alumina, prior to use. Plastocyanin, which has a considerable overall negative charge and a surface acidic patch which is important in forming a productive electron transfer complex with its redox partners, gave a faradaic signal at pre-treated BDD only in the presence of neomycin, a positively charged polyamine. The voltammetry of azurin, which has a small overall charge and no surface acidic patch, was obtained identically in the presence and absence of neomycin. Investigations were also carried out into the voltammetry of two site-directed mutants of azurin, M64E azurin and M44K azurin, each of which introduce a charge into the protein's surface hydrophobic patch. The oxidizing and cleaning effects of the BDD electrode pre-treatments were studied electrochemically using two inorganic probe ions, Fe(China){sub 6} {sup 3-} and Ru(NH{sub 3}){sub 6} {sup 3+}, and by X-ray photoelectron spectroscopy (XPS). All of the electrochemical results are discussed in relation to the electrostatic and hydrophobic contributions to the protein/diamond electrochemical interaction.

  18. Neutron radiations effects on tungsten and vanadium oxides doped with boron

    International Nuclear Information System (INIS)

    We present the preliminary results of the Monte Carlo simulation of the damage produced in thin tungsten and vanadium oxide doped with boron by the α particles and lithium ions (Li+), generated as a result of the nuclear reaction 10B(n, α)7Li. The algorithm used in the simulation is based on the technique of approach of binary collisions, implemented in the package TRIM. In the numerical experiment are generated randomly α particles and ions 7Li with energy 1473 ± 50keV and 840 ± 50keV respectively, that soon interacts with the components of the material. The important parameter as the nuclear and electronic stopping power of both particles is calculated. The average walk of α particles in V2O5 is approximately 3,78 μm, whereas in amorphous WO3 is 4,19 μm. We observed that there is greater damage produced by particles of 7Li, in comparison that the produced by α particles for both materials. (author)

  19. Electrochemical incineration of dimethyl phthalate by anodic oxidation with boron-doped diamond electrode

    Institute of Scientific and Technical Information of China (English)

    HOU Yining; QU Jiuhui; ZHAO Xu; LIU Huijuan

    2009-01-01

    The anodic oxidation of aqueous solutions containing dimethyl phthalate (DMP) up to 125 mg/L with sodium sulfate (Na2SO4) as supporting electrolyte within the pH range 2.0-10.0 was studied using a one-compartment batch reactor employing a boron-doped diamond (BDD) as anode. Electrolyses were carried out at constant current density (1.5-4.5 mA/cm2). Complete mineralization was always achieved owing to the great concentration of hydroxyl radical (·OH) generated at the BDD surface. The effect of pH, apparent current density and initial DMP concentration on the degradation rate of DMP, the specific charge required for its total mineralization and mineralization current efficiency was investigated systematically. The mineralization rate of DMP was found to be pH-independent and to increase with increasing applied current density. Results indicated that this electrochemical process was subjected, at least partially, to the mass transfer of organics onto the BDD surface. Kinetic analysis of the temporal change of DMP concentration during electrolysis determined by High Performance Liquid Chromatography (HPLC) revealed that DMP decay under all tested conditions followed a pseudo first-order reaction. Aromatic intermediates and generated carboxylic acids were identified by Gas Chromatography-Mass Spectrometry (GC-MS) and a general pathway for the electrochemical incineration of DMP on BDD was proposed.

  20. Electrochemical oxidation of biological pretreated and membrane separated landfill leachate concentrates on boron doped diamond anode

    Science.gov (United States)

    Zhou, Bo; Yu, Zhiming; Wei, Qiuping; Long, HangYu; Xie, Youneng; Wang, Yijia

    2016-07-01

    In the present study, the high quality boron-doped diamond (BDD) electrodes with excellent electrochemical properties were deposited on niobium (Nb) substrates by hot filament chemical vapor deposition (HFCVD) method. The electrochemical oxidation of landfill leachate concentrates from disc tube reverse osmosis (DTRO) process over a BDD anode was investigated. The effects of varying operating parameters, such as current density, initial pH, flow velocity and cathode material on degradation efficiency were also evaluated following changes in chemical oxygen demand (COD) and ammonium nitrogen (NH3sbnd N). The instantaneous current efficiency (ICE) was used to appraise different operating conditions. As a result, the best conditions obtained were as follows, current density 50 mA cm-2, pH 5.16, flow velocity 6 L h-1. Under these conditions, 87.5% COD and 74.06% NH3sbnd N removal were achieved after 6 h treatment, with specific energy consumption of 223.2 kWh m-3. In short, these results indicated that the electrochemical oxidation with BDD/Nb anode is an effective method for the treatment of landfill leachate concentrates.

  1. Continuous and selective measurement of oxytocin and vasopressin using boron-doped diamond electrodes.

    Science.gov (United States)

    Asai, Kai; Ivandini, Tribidasari A; Einaga, Yasuaki

    2016-01-01

    The electrochemical detection of oxytocin using boron-doped diamond (BDD) electrodes was studied. Cyclic voltammetry of oxytocin in a phosphate buffer solution exhibits an oxidation peak at +0.7 V (vs. Ag/AgCl), which is attributable to oxidation of the phenolic group in the tyrosyl moiety. Furthermore, the linearity of the current peaks obtained in flow injection analysis (FIA) using BDD microelectrodes over the oxytocin concentration range from 0.1 to 10.0 μM with a detection limit of 50 nM (S/N = 3) was high (R(2) = 0.995). Although the voltammograms of oxytocin and vasopressin observed with an as-deposited BDD electrode, as well as with a cathodically-reduced BDD electrode, were similar, a clear distinction was observed with anodically-oxidized BDD electrodes due to the attractive interaction between vasopressin and the oxidized BDD surface. By means of this distinction, selective measurements using chronoamperometry combined with flow injection analysis at an optimized potential were demonstrated, indicating the possibility of making selective in situ or in vivo measurements of oxytocin. PMID:27599852

  2. Effect of substrate temperature on the growth and properties of boron-doped microcrystalline silicon films

    Institute of Scientific and Technical Information of China (English)

    Lei Qing-Song; Wu Zhi-Meng; Geng Xin-Hua; Zhao Ying; Sun Jian; Xi Jian-Ping

    2006-01-01

    Highly conductive boron-doped hydrogenated microcrystalline silicon (μc-Si:H) films are prepared by very high frequency plasma enhanced chemical vapour deposition (VHF PECVD) at the substrate temperatures (Ts) ranging from 90℃ to 270℃. The effects of Ts on the growth and properties of the films are investigated. Results indicate that the growth rate, the electrical (dark conductivity, carrier concentration and Hall mobility) and structural (crystallinity and grain size) properties are all strongly dependent on Ts. As Ts increases, it is observed that 1) the growth rate initially increases and then arrives at a maximum value of 13.3 nm/min at Ts=210℃, 2) the crystalline volume fraction (Xc) and the grain size increase initially, then reach their maximum values at Ts = 140℃, and finally decrease, 3) the dark conductivity (σd),carrier concentration and Hall mobility have a similar dependence on Tg and arrive at their maximum values at Ts=190℃. In addition, it is also observed that at a lower substrate temperature Ts, a higher dopant concentration is required in order to obtain a maximum σd.

  3. Electrochemical degradation of chlorobenzene on boron-doped diamond and platinum electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Liu Lei [Department of Chemistry, Tongji University, Shanghai, 200092 (China); Zhao Guohua, E-mail: g.zhao@tongji.edu.cn [Department of Chemistry, Tongji University, Shanghai, 200092 (China); Wu Meifen; Lei Yanzhu; Geng Rong [Department of Chemistry, Tongji University, Shanghai, 200092 (China)

    2009-08-30

    In this paper the electrochemical degradation of chlorobenzene (CB) was investigated on boron-doped diamond (BDD) and platinum (Pt) anodes, and the degradation kinetics on these two electrodes was compared. Compared with the total mineralization with a total organic carbon (TOC) removal of 85.2% in 6 h on Pt electrode, the TOC removal reached 94.3% on BDD electrode under the same operate condition. Accordingly, the mineralization current efficiency (MCE) during the mineralization on BDD electrode was higher than that on the Pt electrode. Besides TOC, the conversion of CB, the productions and decay of intermediates were also monitored. Kinetic study indicated that the decay of CB on BDD and Pt electrodes were both pseudo-first-order reactions, and the reaction rate constant (k{sub s}) on BDD electrode was higher than that on Pt electrode. The different reaction mechanisms on the two electrodes were investigated by the variation of intermediates concentrations. Two different reaction pathways for the degradation of CB on BDD electrode and Pt electrode involving all these intermediates were proposed.

  4. Electrochemical degradation of chlorobenzene on boron-doped diamond and platinum electrodes.

    Science.gov (United States)

    Liu, Lei; Zhao, Guohua; Wu, Meifen; Lei, Yanzhu; Geng, Rong

    2009-08-30

    In this paper the electrochemical degradation of chlorobenzene (CB) was investigated on boron-doped diamond (BDD) and platinum (Pt) anodes, and the degradation kinetics on these two electrodes was compared. Compared with the total mineralization with a total organic carbon (TOC) removal of 85.2% in 6h on Pt electrode, the TOC removal reached 94.3% on BDD electrode under the same operate condition. Accordingly, the mineralization current efficiency (MCE) during the mineralization on BDD electrode was higher than that on the Pt electrode. Besides TOC, the conversion of CB, the productions and decay of intermediates were also monitored. Kinetic study indicated that the decay of CB on BDD and Pt electrodes were both pseudo-first-order reactions, and the reaction rate constant (k(s)) on BDD electrode was higher than that on Pt electrode. The different reaction mechanisms on the two electrodes were investigated by the variation of intermediates concentrations. Two different reaction pathways for the degradation of CB on BDD electrode and Pt electrode involving all these intermediates were proposed. PMID:19264395

  5. High field magnetic behavior in Boron doped Fe2VAl Heusler alloys

    Science.gov (United States)

    Venkatesh, Ch.; Vasundhara, M.; Srinivas, V.; Rao, V. V.

    2016-11-01

    We have investigated the magnetic behavior of Fe2VAl1-xBx (x=0, 0.03, 0.06 and 0.1) alloys under high temperature and high magnetic field conditions separately. Although, the low temperature DC magnetization data for the alloys above x>0 show clear magnetic transitions, the zero field cooled (ZFC) and field cooled (FC) curves indicate the presence of spin cluster like features. Further, critical exponent (γ) deduced from the initial susceptibility above the Tc, does not agree with standard models derived for 3 dimensional long range magnetic systems. The deviation in γ values are consistent with the short range magnetic nature of these alloys. We further extend the analysis of magnetic behavior by carrying the magnetization measurements at high temperatures and high magnetic fields distinctly. We mainly emphasize the following observations; (i) The magnetic hysteresis loops show sharp upturns at lower fields even at 900 K for all the alloys. (ii) High temperature inverse susceptibility do not overlap until T=900 K, indicating the persistent short range magnetic correlations even at high temperatures. (iii) The Arrott's plot of magnetization data shows spontaneous moment (MS) for the x=0 alloy at higher magnetic fields which is absent at lower fields (<50 kOe), while the Boron doped samples show feeble MS at lower fields. The origin of this short range correlation is due to presence of dilute magnetic heterogeneous phases which are not detected from the X-ray diffraction method.

  6. Adsorption properties of boroxol ring doped zigzag boron nitride nanotube toward NO molecule using DFT

    Science.gov (United States)

    Zahedi, Ehsan; Babaie, Mahsa; Bahmanpour, Hooman

    2016-05-01

    In previous researches it is demonstrated that reactivity and sensitivity of boron nitride nanotubes (BNNTs) toward gas molecules can be modified by impurity. In this work, oxygen defect for three nitrogen sites was used to study the adsorption of NO molecule through the surface of boroxol ring of oxygen doped BNNT (7,0) with different adsorption patterns, including side-on and end-on. All calculations are performed using the DFT-B3LYP/6-31G∗ level of theory, and their electronic energies are corrected by gCP and D3 correction terms. High binding energies indicate that NO molecule undergoes chemical adsorption with large charge transfer from the tube which can significantly change electronic properties of the tube. Density of state (DOS) and partial DOS (PDOS) analyses revealed that adsorption of NO molecule on the boroxol ring position is covalent in nature with significant effect on the electronic properties of tube. The Laplacian of electron density, Lagrangian kinetic energy density, Hamiltonian kinetic energy density and potential energy density at bond critical points between the tube and NO indicate that the interaction between the tube and NO molecule is covalent in nature. Topological analysis of the electron localization function shows that electrons in the new formed bonds are approximately localized, meaning that the nature of adsorption process is chemical covalent. The studied nanotube is a suitable candidate to filter and eliminate NO gas molecule.

  7. Simultaneous Chronoamperometric Sensing of Ascorbic Acid and Acetaminophen at a Boron-Doped Diamond Electrode

    Directory of Open Access Journals (Sweden)

    Ciprian Radovan

    2008-06-01

    Full Text Available Cyclic voltammetry (CV and chronoamperometry (CA have been used to sense and determine simultaneously L-ascorbic acid (AA and acetaminophen (AC at a boron-doped diamond electrode (BDDE in a Britton-Robinson buffer solution. The calibration plots of anodic current peak versus concentration obtained from CV and CA data for both investigated compounds in single and di-component solutions over the concentration range 0.01 mM – 0.1 mM proved to be linear, with very good correlation parameters. Sensitivity values and RSD of 2-3% were obtained for various situations, involving both individual and simultaneous presence of AA and AC. The chronoamperometric technique associated with standard addition in sequential one step and/or two successive and continuous chronoamperograms at two characteristic potential levels represented a feasible option for the simultaneous determination of AA and AC in real sample systems such as pharmaceutical formulations. The average values indicated by the supplier were confirmed to a very close approximation from chronoamperomgrams by using several additions with the application of suitable current correction factors.

  8. Continuous and selective measurement of oxytocin and vasopressin using boron-doped diamond electrodes

    Science.gov (United States)

    Asai, Kai; Ivandini, Tribidasari A.; Einaga, Yasuaki

    2016-09-01

    The electrochemical detection of oxytocin using boron-doped diamond (BDD) electrodes was studied. Cyclic voltammetry of oxytocin in a phosphate buffer solution exhibits an oxidation peak at +0.7 V (vs. Ag/AgCl), which is attributable to oxidation of the phenolic group in the tyrosyl moiety. Furthermore, the linearity of the current peaks obtained in flow injection analysis (FIA) using BDD microelectrodes over the oxytocin concentration range from 0.1 to 10.0 μM with a detection limit of 50 nM (S/N = 3) was high (R2 = 0.995). Although the voltammograms of oxytocin and vasopressin observed with an as-deposited BDD electrode, as well as with a cathodically-reduced BDD electrode, were similar, a clear distinction was observed with anodically-oxidized BDD electrodes due to the attractive interaction between vasopressin and the oxidized BDD surface. By means of this distinction, selective measurements using chronoamperometry combined with flow injection analysis at an optimized potential were demonstrated, indicating the possibility of making selective in situ or in vivo measurements of oxytocin.

  9. Structural modification of boron-doped ZnO layers caused by hydrogen outgassing

    Energy Technology Data Exchange (ETDEWEB)

    Lovics, R.; Csik, A., E-mail: csik@atomki.hu; Takáts, V.; Hakl, J.; Vad, K.

    2015-07-01

    Results of annealing experiments of boron-doped zinc oxide (ZnO:B) layers prepared by low pressure chemical vapor deposition method on polished Si, soda-lime glass for windows, and AF45 Schott alkali free thin glass substrates are presented. It is shown that short annealing of samples at 150 °C and 300 °C in air causes serious surface degradation of samples prepared on Si and soda-lime glass substrate. The characteristic feature of degradation is the creation of bubbles and craters on the sample surface which fully destroy the continuity of zinc oxide layers. The results of depth distribution mapping of elements indicate that the formation of bubbles is linked to increase in hydrogen concentration in the layer. The surface degradation was not noticed on samples deposited on AF45 Schott alkali free thin glass which has a SiO{sub 2} diffusion barrier layer on the surface, only much fewer and smaller bubbles were visible. The results indicate the important role of hydrogen outgassing from the substrate induced by a thermal shock.

  10. Amperometric oxygen sensor based on a platinum nanoparticle-modified polycrystalline boron doped diamond disk electrode.

    Science.gov (United States)

    Hutton, Laura; Newton, Mark E; Unwin, Patrick R; Macpherson, Julie V

    2009-02-01

    Pt nanoparticle (NP)-modified polycrystalline boron-doped diamond (pBDD) disk electrodes have been fabricated and employed as amperometric sensors for the determination of dissolved oxygen concentration in aqueous solution. pBDD columns were cut using laser micromachining techniques and sealed in glass, in order to make disk electrodes which were then characterized electrochemically. Electrodeposition of Pt onto the diamond electrodes was optimized so as to give the maximum oxygen reduction peak current with the lowest background signal. Pt NPs, >0-10 nm diameter, were found to deposit randomly across the pBDD electrode, with no preference for grain boundaries. The more conductive grains were found to promote the formation of smaller nanoparticles at higher density. With the use of potential step chronoamperometry, in which the potential was stepped to a diffusion-limited value, a four electron oxygen reduction process was found to occur at the Pt NP-modified pBDD electrode. Furthermore the chronoamperometric response scaled linearly with dissolved oxygen concentration, varied by changing the oxygen/nitrogen ratio of gas flowed into solution. The sensor was used to detect dissolved oxygen concentrations with high precision over the pH range 4-10. PMID:19117391

  11. Studies on the oxygen precipitation in highly boron doped silicon; Untersuchungen zur Sauerstoffausscheidung in hoch bordotiertem Silicium

    Energy Technology Data Exchange (ETDEWEB)

    Zschorsch, Markus

    2007-12-14

    The aim of this thesis was the getting of new knowledge on the elucidation of the oxygen precipitation in highly doped silicon. In the study of the early phases of the oxygen precipitation boron-oxygen complexes and their kinetics could be indirectly detected. These arise already during the cooling of the crystal and can be destroyed by subsequent temperature processes. The formation of the here as BO assumed species during the cooling after the silicon crystal fabrication could be numerically reproduced. Furthermore the study of early precipitation phases by means of neutron small angle scattering a maximum of the oxygen precipitation at {rho}=9 m{omega}cm. It could be shown that the decreasing of this at increasing boron concentration can be most probably reduced to boron precipitations. Furthermore it could be shown that after a tempering time of 24 hours at 700 C in silicon with {rho}=9 m{omega}cm platelet-shaped precipitates form. By the study of the precipitate growth could be shown that also in this phase the oxygen precipitation in silicon is strongest with a specific resistance of {rho}=9 m{omega}cm. By means of FTIR spectroscopy a new absorption band at a wave number of 1038 cm{sup -1} was found, which could be assigned to a boron species. By different experiments it is considered as probable that at this species it deals with BI respectively B{sub 2}I complexes.

  12. Diffusion-driven precipitate growth and ripening of oxygen precipitates in boron doped silicon by dynamical x-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Will, J., E-mail: will@krist.uni-erlangen.de; Gröschel, A.; Bergmann, C.; Magerl, A. [Crystallography and Structural Physics, University of Erlangen-Nürnberg, Staudtstr. 3, 91058 Erlangen (Germany); Spiecker, E. [Center for Nanoanalysis and Electron Microscopy, University of Erlangen-Nürnberg, Cauerstr. 6, 91058 Erlangen (Germany)

    2014-03-28

    X-ray Pendellösung fringes from three silicon single crystals measured at 900 °C are analyzed with respect to density and size of oxygen precipitates within a diffusion-driven growth model and compared with TEM investigations. It appears that boron doped (p+) material shows a higher precipitate density and a higher strain than moderately (p-) boron crystals. In-situ diffraction reveals a diffusion-driven precipitate growth followed by a second growth regime in both materials. An interpretation of the second growth regime in terms of Ostwald ripening yields surface energy values (around 70 erg/cm{sup 2}) similar to published data. Further, an increased nucleation rate by a factor of ∼13 is found in the p+ sample as compared to a p- sample at a nucleation temperature of 450 °C.

  13. Research on the direct doping effect of silicon on cubic boron nitride ceramics by UV-VIS diffuse reflectance

    International Nuclear Information System (INIS)

    Cubic boron nitride (cBN) micro-powders mixed with 1 wt% silicon were sintered at 1450 deg. C under a pressure of 5.0 GPa. The grain boundaries and silicon distribution in Si-cBN ceramics were studied by scanning electronic microscope (SEM) and energy-dispersive spectrometer (EDS). Optical properties of the ceramics were investigated by UV-VIS diffuse reflectance and photoluminescence spectra at room temperature. Some important parameters of studied ceramics such as absorption coefficient and defect levels were identified from reflection spectra by intercept method. The experimental results indicated the direct n-doped effect of silicon on cubic boron nitride ceramics. With a direct forbidden transition characteristic, the donor energy level of Si in forbidden zone of cBN ceramics was found to be 2.82 eV. The phonon energy related to the direct forbidden transition was 0.235 eV.

  14. Study on excimer laser irradiation for controlled dehydrogenation and crystallization of boron doped hydrogenated amorphous/nanocrystalline silicon multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Gontad, F., E-mail: fran_gontad@yahoo.es [Applied Physics Department, University of Vigo, E.I. Industrial, Campus de As Lagoas, Marcosende, E-36310, Vigo (Spain); Conde, J.C. [Applied Physics Department, University of Vigo, E.I. Industrial, Campus de As Lagoas, Marcosende, E-36310, Vigo (Spain); Filonovich, S.; Cerqueira, M.F.; Alpuim, P. [Department of Physics, University of Minho, Campus de Azurém, 4800-058 Guimarães (Portugal); Chiussi, S. [Applied Physics Department, University of Vigo, E.I. Industrial, Campus de As Lagoas, Marcosende, E-36310, Vigo (Spain)

    2013-06-01

    We report on the excimer laser annealing (ELA) induced temperature gradients, allowing controlled crystallization and dehydrogenation of boron-doped a-Si:H/nc-Si:H multilayers. Depth of the dehydrogenation and crystallization process has been studied numerically and experimentally, showing that temperatures below the monohydride decomposition can be used and that significant changes of the doping profile can be avoided. Calculation of temperature profiles has been achieved through numerical modeling of the heat conduction differential equation. Increase in the amount of nano-crystals, but not in their size, has been demonstrated by Raman spectroscopy. Effective dehydrogenation and shape of the boron profile have been studied by time of flight secondary ion mass spectroscopy. The relatively low temperature threshold for dehydrogenation, below the monohydride decomposition temperature, has been attributed to both, the large hydrogen content of the original films and the partial crystallization during the ELA process. The results of this study show that UV-laser irradiation is an effective tool to improve crystallinity and dopant activation in p{sup +}-nc-Si:H films without damaging the substrate. - Highlights: • An efficient dehydrogenation is possible through excimer laser annealing. • 140 mJ/cm{sup 2} is enough for dehydrogenation without significant changes in doping profile. • Fluences up to 300 mJ/cm{sup 2} promote partial crystallization of the amorphous structures.

  15. Effect of reaction conditions on methyl red degradation mediated by boron and nitrogen doped TiO{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Galenda, A., E-mail: galenda@ieni.cnr.it [CNR-IENI, Istituto per l’Energetica e le Interfasi, Corso Stati Uniti, 4 35127 Padova (Italy); Crociani, L.; Habra, N. El; Favaro, M. [CNR-IENI, Istituto per l’Energetica e le Interfasi, Corso Stati Uniti, 4 35127 Padova (Italy); Natile, M.M. [CNR-IENI, Istituto per l’Energetica e le Interfasi, Dipartimento di Scienze Chimiche, Università di Padova, via F. Marzolo, 1 35131 Padova (Italy); Rossetto, G. [CNR-IENI, Istituto per l’Energetica e le Interfasi, Corso Stati Uniti, 4 35127 Padova (Italy)

    2014-09-30

    Highlights: • Boron and/or nitrogen-doped TiO{sub 2} for photocatalytic wastewater treatment. • Methyl red degradation/mineralisation as a function of pH, acids and dopants. • Adsorption time influence on photocatalytic process. • Recovery of worn-out catalyst. - Abstract: Nowadays the employment of renewable and sustainable energy sources, and solar light as main option, becomes an urgent need. Photocatalytic processes received great attention in wastewater treatment due to their cheapness, environmental compatibility and optimal performances. Despite the general low selectivity of the photocatalysts, an accurate optimisation of the operational parameters needs to be carried out in order to maximise the process yield. Because of this reason, the present contribution aims to deepen either the knowledge in boron and/or nitrogen doped TiO{sub 2}-based systems and their employment in methyl red removal from aqueous solutions. The samples were obtained by coprecipitation and characterised by XRD, SEM, BET specific surface area, UV–vis and XPS techniques. The catalytic activity was for the first time carefully evaluated with respect to methyl red photodegradation in different conditions as a function of working pH, counter-ions and pre-adsorption time. An ad-hoc study was performed on the importance of the pre-adsorption of the dye, suggesting that an extended adsorption is useless for the catalyst photoactivity, while a partial coverage is preferable. The photocatalytic tests demonstrate the positive influence of boron doping in photo-activated reactions and the great importance of the operational parameters with respect to the simple methyl red bleaching rather than the overall pollutant mineralisation. It is proved, indeed, that different working pH, acidifying means and substrate pre-adsorption time can enhance or limit the catalyst performances with respect to the complete pollutant degradation rather than its partial breakage.

  16. Magnetism of single-walled silicon carbide nanotubes doped by boron, nitrogen and oxygen

    Energy Technology Data Exchange (ETDEWEB)

    Maghnaoui, Ahmed [Laboratoire de Physique, Universite du 08 mai 45, BP 401, 24000 Guelma (Algeria); Boufelfel, Ahmed, E-mail: ahboufelfel@gmail.com [Laboratoire de Physique, Universite du 08 mai 45, BP 401, 24000 Guelma (Algeria)

    2012-09-15

    We calculated, using spin polarized density functional theory, the electronic properties of zigzag (10,0) and armchair (6,6) semiconductor silicon carbide nanotubes (SiCNTs) doped once at the time with boron, nitrogen, and oxygen. We have looked at the two possible scenarios where the guest atom X (B, N, O), replaces the silicon X{sub Si}, or the carbon atom X{sub C}, in the unit cell. We found that in the case of one atom B - SiCNT replacing a carbon atom position annotated by B{sub C} exhibits a magnetic moment of 1 {mu}{sub B}/cell in both zigzag and armchair nanotubes. Also, B replacing Si, (B{sub Si}), induce a magnetic moment of 0.46 {mu}{sub B}/cell in the zigzag (10,0) but no magnetic moment in armchair (6,6). For N substitution; (N{sub C}) and (N{sub Si}) each case induce a magnetic moment of 1 {mu}{sub B}/cell in armchair (6,6), while N{sub Si} give rise to 0.75 {mu}{sub B}/cell in zigzag (10,0) and no magnetic moment for N{sub C}. In contrast the case of O{sub C} and O{sub Si} did not produce any net magnetic moment in both zigzag and armchair geometries. - Highlights: Black-Right-Pointing-Pointer Calculation scheme the one implemented in the SIESTA. Black-Right-Pointing-Pointer Materials studied SiCNT, B - SiCNT, N - SiCNT and O - SiCNT. Black-Right-Pointing-Pointer Magnetism in single wall SiCNTs when one atom of C or Si is replaced by B or N zigzag (10,0) and armchair (6,6).

  17. Bioelectrochemical degradation of urea at platinized boron doped diamond electrodes for bioregenerative applications

    Science.gov (United States)

    Nicolau, Eduardo; Gonzalez, Ileana; Nicolau, Eduardo; Cabrera, Carlos R.

    The recovery of potable water from space mission wastewater is critical for the life support and environmental health of crew members in long-term missions. NASA estimates reveal that at manned space missions 0.06 kg/person·day of urine is produced, with urea and various salts as its main components. Current spacecraft water reclamation strategies include the utilization of not only multifiltration systems (MF) and reverse osmosis (RO), but also biological components to deal with crew urine streams. In this research we explore the utilization of urease (EC 3.5.1.5) to convert urea directly to nitrogen by the in-situ utilization of the reaction products, to increase the amount of clean water in future space expeditions. First of all, platinum was electrodeposited on boron doped diamond electrodes by cycling the potential between -0.2 V and 1.0 V in metal/0.5 M H2SO4 solution. SEM images of the electrodes showed a distribution of platinum nanoparticles ranging between 50 nm and 300 nm. The biochemical reaction of urease in nature produces ammonia and carbon dioxide from urea. Based on this, Cyclic Voltammetry experiments of an ammonium acetate solution at pH 10 were performed showing an anodic peak at -0.3 V vs. Ag/AgCl due to the ammonia oxidation. Then, a urease solution (Jack Bean) was poured into the electrochemical cell and subsequent additions of urea were performed with the potential held at -0.3 V in order to promote ammonia oxidation. Chronoamperometry data shows that with more than five urea additions the enzyme still responding by producing ammonia, which is being subsequently oxidized at the electrode surface and producing molecular nitrogen. This research has tremendous applications for future long-term space missions since the reaction byproducts could be used for a biomass subsystem (in-situ resource recovery), while generating electricity from the same process.

  18. Decomposition of various endocrine-disrupting chemicals at boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Yoshihara, S. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)], E-mail: sachioy@cc.utsunomiya-u.ac.jp; Murugananthan, M. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)

    2009-02-28

    Anodic decomposition of endocrine disrupting chemicals (EDCs) namely, 17{beta}-estradiol (E2) and Bisphenol A (BPA) at boron-doped diamond (BDD) has been studied with a working solution volume of 250 ml under galvanostatic mode. Cyclic voltammetric experiments were performed to examine the redox response of E2 and BPA as a function of cycle number. Kinetic analysis suggests that electro-oxidation reaction of EDCs undergo the control of applied current density (I{sub appl}). The mineralization behavior of EDCs was investigated at BDD anode monitoring the total organic carbon (TOC) value at three different I{sub appl}. Electrolysis at high anodic potential causes complex oxidation of EDCs that lead to form the final sole product as CO{sub 2}. From these TOC results, the mineralization current efficiency was evaluated and discussed. In order to examine the effect of electrolyte variables on EDCs, BPA compound was taken and undergone the supporting medium and pH variation experiments. Considering global oxidation process, the effect of supporting medium (Na{sub 2}SO{sub 4}, NaNO{sub 3}, and NaCl) has been discussed in terms of electro-generated inorganic oxidants such as S{sub 2}O{sub 8}{sup 2-}, H{sub 2}O{sub 2} and ClO{sup -}. The better performance of BDD anode was proved on a comparative study with Pt and glassy carbon under similar experimental conditions. A possible reaction mechanism for BPA degradation involving three main aromatic intermediates, identified by GC-MS analysis, was proposed.

  19. Mechanistic studies on boron-doped diamond: Oxidation of small organic molecules

    International Nuclear Information System (INIS)

    The electro-oxidation of ethanol, acetone, i-propanol, its fluorinated analogue hexafluoroisopropanol (HFiP) and cyclohexane in 1 M HClO4 was studied on a boron doped diamond (BDD) electrode by on-line differential electrochemical mass spectrometry (DEMS), using a dual thin layer cell. One can distinguish two oxidation pathways: at potentials below 2.5 V a direct electron transfer to the BDD takes place, while at potentials above 2.5 V OH radicals are produced and scavenged by the reactants. As a consequence, the oxygen evolution reaction is at least partially suppressed. The direct electron transfer to the electrode is observed for i-propanol, ethanol and cyclohexane. For acetone and HFiP, only the second, indirect, pathway with the participation of OH radicals is effective. For all the reactants except HFiP CO2 formation was observed generally at 2.5 V or higher, the potential for the oxygen evolution reaction (OER) in the pure supporting electrolyte. Hence OH radicals are instrumental in the cleavage of C-C bonds. For HFiP, the cyclic voltammograms of the supporting electrolyte with and without the reactant are identical. This indicates that the oxidation of HFiP is initiated by OH radicals followed by a further electron transfer to the electrode, similarly to the oxidation of CO (I. Kisacik, A. Stefanova, S. Ernst and H. Baltruschat, PCCP, 15 (2013) 4616). For both pathways, the reactivity follows the same trend as the homogeneous hydrogen abstraction reaction rates with OH radicals. The intermediate radicals formed in the reaction with the electro-generated OH radicals can react with oxygen present in the solution

  20. Synthesis and characterization of carbon or/and boron-doped CdS nanoparticles and investigation of optical and photoluminescence properties

    International Nuclear Information System (INIS)

    Un-doped and carbon or/and boron doped Cadmium sulfide nanoparticles were prepared via chemical co-precipitation procedure by Polyvinyl pyrrolidone (PVP) as a stabilizer. The optical and structural properties were investigated using several techniques. The morphology of CdS nanophotocatalyst was characterized using X-ray diffraction (XRD) and scanning electron microscopy. The optical properties of both un-doped and doped samples were carried out by photoluminescence (PL) spectroscopy and UV–vis Diffuse reflectance spectra (DRS). An optimum doping level of the atoms dopant for enhanced PL properties are found through optical study. Degradation of Amoxicillin under UV light elucidation was applied to appraise the photocatalytic efficiency. The results show that the carbon and boron doping CdS nanoparticles has high potential in green chemistry. - Highlights: • Un-doped, C or/and B-doped CdS nanoparticles were successfully synthesized. • The Blue shift was observed in UV–vis absorption spectra for the doped nanoparticles. • Doping of CdS with C and B enhances the fluorescence

  1. Synthesis and characterization of carbon or/and boron-doped CdS nanoparticles and investigation of optical and photoluminescence properties

    Energy Technology Data Exchange (ETDEWEB)

    Fakhri, Ali, E-mail: ali.fakhri88@yahoo.com [Department of Chemistry, Shahr-e-Qods Branch, Islamic Azad University, Tehran (Iran, Islamic Republic of); Young Researchers and Elite Club, Science and Research Branch, Islamic Azad University, Tehran (Iran, Islamic Republic of); Khakpour, Reza [Department of Physics, Tehran North Branch, Islamic Azad University, Tehran (Iran, Islamic Republic of)

    2015-04-15

    Un-doped and carbon or/and boron doped Cadmium sulfide nanoparticles were prepared via chemical co-precipitation procedure by Polyvinyl pyrrolidone (PVP) as a stabilizer. The optical and structural properties were investigated using several techniques. The morphology of CdS nanophotocatalyst was characterized using X-ray diffraction (XRD) and scanning electron microscopy. The optical properties of both un-doped and doped samples were carried out by photoluminescence (PL) spectroscopy and UV–vis Diffuse reflectance spectra (DRS). An optimum doping level of the atoms dopant for enhanced PL properties are found through optical study. Degradation of Amoxicillin under UV light elucidation was applied to appraise the photocatalytic efficiency. The results show that the carbon and boron doping CdS nanoparticles has high potential in green chemistry. - Highlights: • Un-doped, C or/and B-doped CdS nanoparticles were successfully synthesized. • The Blue shift was observed in UV–vis absorption spectra for the doped nanoparticles. • Doping of CdS with C and B enhances the fluorescence.

  2. Explaining Morphological and Electrical Features of Boron-doped Zinc Oxide to Tailor New Electrodes for Photovoltaics

    OpenAIRE

    Fanni, Lorenzo

    2016-01-01

    TCOs are a class of metal oxides that combine transparency to visible light with electrical conductivity. Each TCO is characterized by the trade-off of these two properties which can be tuned for a particular application. This thesis is dedicated to the investigation of one TCO material: boron doped zinc oxide (ZnO:B) deposited by low-pressure chemical vapor deposition (LP-MOCVD). Its main distinction is low absorptance which makes ZnO films deposited by LP-MOCVD ideal as transparent electro...

  3. Feedback-amplified electrochemical dual-plate boron-doped diamond microtrench detector for flow injection analysis

    Science.gov (United States)

    Lewis, Grace E M; Gross, Andrew J; Kasprzyk-Hordern, Barbara; Lubben, Anneke T; Marken, Frank

    2015-01-01

    An electrochemical flow cell with a boron-doped diamond dual-plate microtrench electrode has been developed and demonstrated for hydroquinone flow injection electroanalysis in phosphate buffer pH 7. Using the electrochemical generator-collector feedback detector improves the sensitivity by one order of magnitude (when compared to a single working electrode detector). The diffusion process is switched from an analyte consuming “external” process to an analyte regenerating “internal” process with benefits in selectivity and sensitivity. PMID:25735831

  4. EFFECT OF POLISHING ON THE FRICTION BEHAVIORS AND CUTTING PERFORMANCE OF BORON-DOPED DIAMOND FILMS ON WC-Co INSERTS

    OpenAIRE

    LIANG WANG; BIN SHEN; FANGHONG SUN; ZHIMING ZHANG

    2014-01-01

    Boron doped (B-doped) diamond films are deposited onto WC-Co inserts by HFCVD with the mixture of acetone, trimethyl borate (C3H9BO3) and H2. The as-deposited B-doped diamond films are characterized with scanning electron microscope (SEM), X-ray diffraction (XRD) spectroscopy, Raman spectroscopy, 3D surface topography based on white-light interferometry and Rockwell hardness tester. The effects of mechanical polishing on the friction behavior and cutting performance of B-doped diamond are eva...

  5. Localization of dislocation-related luminescence centers in self-ion implanted silicon and effect of additional boron ion doping

    Energy Technology Data Exchange (ETDEWEB)

    Tetelbaum, D.I.; Mikhaylov, A.N.; Belov, A.I.; Korolev, D.S.; Shushunov, A.N.; Bobrov, A.I.; Pavlov, D.A. [Lobachevsky State University of Nizhni Novgorod (Russian Federation); Shek, E.I.; Sobolev, N.A. [Ioffe Physical Technical Institute, St. Petersburg (Russian Federation)

    2015-01-01

    The depth distribution of light-emitting centers of the D1 dislocation-related photoluminescence line (∝ 1.5 μm) in silicon implanted with Si{sup +} ions and annealed at 1100 C in the oxidizing chlorine-containing atmosphere has been investigated by means of the layer-by-layer chemical etching. It is established with the application of cross-sectional transmission electron microscopy that the main contribution to the D1 line is made by the centers located at the depths of up to ∝ 150 nm, i.e. in the region of Si{sup +} ion ranges, whereas the dislocations produced by Si{sup +} implantation and annealing at 1100 C penetrate to the depth of ∝ 1000 nm. Additional boron ion doping with subsequent annealing at 800 C in N{sub 2} atmosphere improves the emission in comparison with the undoped but annealed reference sample, however the additional annealing at 800 C per se results in the photoluminescence weakening. The dependence of the D1 line intensity on boron ion dose is found to be nonmonotonous. The interpretation of the obtained results is given in relation to the key role of selfinterstitials and boron impurity in the formation of radiative and nonradiative centers. (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Study of Nitrogen Effect on the Boron Diffusion during Heat Treatment in Polycrystalline Silicon/Nitrogen-Doped Silicon Thin Films

    Science.gov (United States)

    Saci, Lynda; Mahamdi, Ramdane; Mansour, Farida; Boucher, Jonathan; Collet, Maéva; Bedel Pereira, Eléna; Temple-Boyer, Pierre

    2011-05-01

    The present paper studies the boron (B) diffusion in nitrogen (N) doped amorphous silicon (a-Si) layer in original bi-layer B-doped polycrystalline silicon (poly-Si)/in-situ N-doped Si layers (NIDOS) thin films deposited by low pressure chemical vapor deposition (LPCVD) technique. The B diffusion in the NIDOS layer was investigated by secondary ion mass spectrometry (SIMS) and Fourier transform infrared spectroscopy (FTIR) analysis. A new extended diffusion model is proposed to fit the SIMS profile of the bi-layer films. This model introduces new terms which take into account the effect of N concentration on the complex diffusion phenomena of B atoms in bi-layer films. SIMS results show that B diffusion does not exceed one third of NIDOS layer thickness after annealing. The reduction of the B diffusion in the NIDOS layer is due to the formation of complex B-N as shown by infrared absorption measurements. Electrical measurements using four-probe and Hall effect techniques show the good conductivity of the B-doped poly-Si layer after annealing treatment.

  7. Fluorine and boron co-doped diamond-like carbon films deposited by pulsed glow discharge plasma immersion ion processing

    CERN Document Server

    He, X M; Peters, A M; Taylor, B; Nastasi, M

    2002-01-01

    Fluorine (F) and boron (B) co-doped diamond-like carbon (FB-DLC) films were prepared on different substrates by the plasma immersion ion processing (PIIP) technique. A pulse glow discharge plasma was used for the PIIP deposition and was produced at a pressure of 1.33 Pa from acetylene (C sub 2 H sub 2), diborane (B sub 2 H sub 6), and hexafluoroethane (C sub 2 F sub 6) gas. Films of FB-DLC were deposited with different chemical compositions by varying the flow ratios of the C sub 2 H sub 2 , B sub 2 H sub 6 , and C sub 2 F sub 6 source gases. The incorporation of B sub 2 H sub 6 and C sub 2 F sub 6 into PIIP deposited DLC resulted in the formation of F-C and B-C hybridized bonding structures. The levels of the F and B concentrations effected the chemical bonding and the physical properties as was evident from the changes observed in density, hardness, stress, friction coefficient, and contact angle of water on films. Compared to B-doped or F-doped DLC films, the F and B co-doping of DLC during PIIP deposition...

  8. Characterization of Optical and Electrical Properties of Transparent Conductive Boron-Doped Diamond thin Films Grown on Fused Silica

    Directory of Open Access Journals (Sweden)

    Bogdanowicz Robert

    2014-12-01

    Full Text Available Abstract A conductive boron-doped diamond (BDD grown on a fused silica/quartz has been investigated. Diamond thin films were deposited by the microwave plasma enhanced chemical vapor deposition (MW PECVD. The main parameters of the BDD synthesis, i.e. the methane admixture and the substrate temperature were investigated in detail. Preliminary studies of optical properties were performed to qualify an optimal CVD synthesis and film parameters for optical sensing applications. The SEM micro-images showed the homogenous, continuous and polycrystalline surface morphology; the mean grain size was within the range of 100-250 nm. The fabricated conductive boron-doped diamond thin films displayed the resistivity below 500 mOhm cm-1 and the transmittance over 50% in the VIS-NIR wavelength range. The studies of optical constants were performed using the spectroscopic ellipsometry for the wavelength range between 260 and 820 nm. A detailed error analysis of the ellipsometric system and optical modelling estimation has been provided. The refractive index values at the 550 nm wavelength were high and varied between 2.24 and 2.35 depending on the percentage content of methane and the temperature of deposition.

  9. Electrochemical Detection of Clenbuterol in Pig Liver at Pyrrole-DNA Modified Boron-doped Diamond Electrode

    Institute of Scientific and Technical Information of China (English)

    WU Jing; LI Xiao-li; WU Xu-mei; HUAN Shuang-yan; SHEN Guo-li; YU Ru-qin

    2005-01-01

    The direct detection of clenbuterol(CL) in pig liver without any extraction separation at a pyrrole-DNA modified boron-doped diamond(BDD) electrode is reported. The pyrrole-DNA modified BDD electrode has a strong electrocatalytic effect on the redox reaction of CL. One oxidization and two reduction peaks of CL appear at 340.2, 299.8 and 166.6 mV(versus SCE), respectively. The pyrrole polymer alone cannot electrocatalyze the above reaction at a BDD electrode; the electrocatalytic effect of a BDD electrode modified with DNA membrane is unsufficient for the analytical detection of CL; the replacement of boron-doped diamond by glass carbon makes the electrocatalytic reaction impossible; the redox process is pH dependent. The influences of various experimental parameters on the pyrrole-DNA modified BDD electrode were investigated. A sensitive cyclic voltammetric response for CL was obtained in a linear range from 3.4×10-6 to 5×10-4 mol/L with a detection limit of 8.5×10-7 mol/L. A mean recovery of 102.7% of CL in the pig liver sample solution and a reproducibility of 3.2% were obtained.

  10. Boron-doped diamond microelectrodes for use in capillary electrophoresis with electrochemical detection.

    Science.gov (United States)

    Cvacka, Josef; Quaiserová, Veronika; Park, JinWoo; Show, Yoshiyuki; Muck, Alexander; Swain, Greg M

    2003-06-01

    The fabrication and characterization of boron-doped diamond microelectrodes for use in electrochemical detection coupled with capillary electrophoresis (CE-EC) is discussed. The microelectrodes were prepared by coating thin films of polycrystalline diamond on electrochemically sharpened platinum wires (76-, 25-, and 10-microm diameter), using microwave-assisted chemical vapor deposition (CVD). The diamond-coated wires were attached to copper wires (current collectors), and several methods were explored to insulate the cylindrical portion of the electrode: nail polish, epoxy, polyimide, and polypropylene coatings. The microelectrodes were characterized by scanning electron microscopy, Raman spectroscopy, and cyclic voltammetry. They exhibited low and stable background currents and sigmoidally shaped voltammetric curves for Ru(NH3)6(3+/2+) and Fe(CN)6(3-/4-) at low scan rates. The microelectrodes formed with the large diameter Pt and sealed in polypropylene pipet tips were employed for end-column detection in CE. Evaluation of the CE-EC system and the electrode performance were accomplished using a 10 mM phosphate buffer, pH 6.0, run buffer, and a 30-cm-long fused-silica capillary (75-microm i.d.) with dopamine, catechol, and ascorbic acid serving as test analytes. The background current (approximately 100 pA) and noise (approximately 3 pA) were measured at different detection potentials and found to be very stable with time. Reproducible separation (elution time) and detection (peak current or area) of dopamine, catechol, and ascorbic acid were observed with response precisions of 4.1% or less. Calibration curves constructed from the peak area were linear over 4 orders of magnitude, up to a concentration between 0.1 and 1 mM. Mass limits of detection for dopamine and catechol were 1.7 and 2.6 fmol, respectively (S/N = 3). The separation efficiency was approximately 33,000, 56,000, and 98,000 plates/m for dopamine, catechol, and ascorbic acid, respectively. In

  11. Dopant deactivation and annealing characteristics of metal-oxide-semiconductor structures on germanium/boron-doped silicon after gamma irradiation or Fowler--Nordheim charge injection

    Energy Technology Data Exchange (ETDEWEB)

    Hashemipour, O.; Ang, S.S.; Brown, W.D.; Yeargan, J.R. (Department of Electrical Engineering, 3217 Bell Engineering Center, University of Arkansas, Fayetteville, Arkansas 72701 (USA)); West, L. (Department of Mechanical Engineering, University of Arkansas, Fayetteville, Arkansas 72701 (USA))

    1991-08-01

    Dopant deactivation and thermal annealing characteristics of metal-oxide-semiconductor capacitors fabricated on Ge/B-doped silicon after gamma irradiation or Fowler--Nordheim injection were investigated for the first time. A decrease of about 30% in active acceptor concentration was observed immediately after gamma irradiation or Fowler--Nordheim injection. Further deactivation of boron ({similar to}20%) occurred with annealing for temperatures of 80 {degree}C and higher. Hydrogen for the deactivation, which occurred during annealing, is thought to come from dissociation of weakly bonded Ge---H formed during the gamma irradiation or Fowler--Nordheim injection. Capacitors fabricated on conventional boron-doped substrates do not exhibit acceptor deactivation as a result of annealing following irradiation or injection. For annealing temperatures of 110 {degree}C and higher, the boron is first deactivated by the process noted above, and then is apparently reactivated by the dissociation of B---H bonds with hydrogen evolution from the structure.

  12. Space-Confined Synthesis of Three-Dimensional Boron/Nitrogen-Doped Carbon Nanotubes/Carbon Nanosheets Line-in-Wall Hybrids and Their Electrochemical Energy Storage Applications

    DEFF Research Database (Denmark)

    Zhu, Shan; Li, Jiajun; Li, Qingfeng;

    2016-01-01

    This research demonstrates a flexible one-pot strategy for fabricating three-dimensional (3D) boron/nitrogen-doped networks of carbon nanotubes(CNTs)/carbon nanosheets "Line-in-Wall" hybrids (LIWNB) based on the space-confined template method. In the synthesis, the high rate of freezing step and ...

  13. First-principles study of metallic carbon nanotubes with boron/nitrogen co-doping

    Institute of Scientific and Technical Information of China (English)

    Chen Ling-Na; Ma Song-Shan; OuYang Fang-Ping; Xiao Jin; Xu Hui

    2011-01-01

    Using the first-principles calculations, we investigate the electronic band structure and the quantum transport properties of metallic carbon nanotubes (MCNTs) with B/N pair co-doping. The results about formation energy show that the B/N pair co-doping configuration is a most stable structure. We find that the electronic structure and the transport properties are very sensitive to the doping concentration of the B/N pairs in MCNTs, where the energy gaps increase with doping concentration increasing both along the tube axis and around the tube, because the mirror symmetry of MCNT is broken by doping B/N pairs. In addition, we discuss conductance dips of the transmission spectrum of doped MCNTs. These unconventional doping effects could be used to design novel nanoelectronic devices.

  14. Influence of Boron doping on the structural, optical and electrical properties of CdO thin films by spray pyrolysis technique

    Energy Technology Data Exchange (ETDEWEB)

    Velusamy, P., E-mail: rampap2k@yahoo.co.in; Babu, R. Ramesh, E-mail: rampap2k@yahoo.co.in [Crystal Growth and Thin Films Laboratory, Department of Physics, Bharathidasan University, Tiruchirappalli- 620024, Tamil Nadu (India); Ramamurthi, K. [Department of Physics and Nanotechnology, Faculty of Engineering and Technology, SRM University, Kattankulathur - 603203, Tamil Nadu (India)

    2014-04-24

    Cadmium oxide and Boron (B) doped Cadmium oxide thin films were deposited using spray pyrolysis technique. The structural, morphological, electrical and optical properties of undoped and B doped CdO films are analyzed by varying the dopant concentration in the solution. The structural study shows the polycrystalline nature and cubic structure of undoped and B doped CdO thin films. Surface morphological study reveals that the grains are spherical in shape. Optical and electrical studies showed n-type semiconducting nature and optical band gap of 2.44 eV of deposited thin films.

  15. Boron/nitrogen pairs Co-doping in metallic carbon nanotubes: a first-principle study

    Institute of Scientific and Technical Information of China (English)

    Ouyang Fang-Ping; Peng Sheng-Lin; Chen Ling-Na; Sun Shu-Yuan; Xu Hui

    2011-01-01

    By using the first-principles calculations, the electronic structure and quantum transport properties of metallic carbon nanotubes with B/N pairs co-doping have been investigated. It is shown that the total energies of metallic carbon nanotubes are sensitive to the doping sites of the B/N pairs. The energy gaps of the doped metallic carbon nanotubes decrease with decreasing the concentration of the B/N pair not only along the tube axis but also around the tube. Moreover, the I-V characteristics and transmissions of the doped tubes are studied. Our results reveal that the conducting ability of the doped tube decreases with increasing the concentrations of the B/N pairs due to symmetry breaking of the system. This fact opens a new way to modulate band structures of metallic carbon nanotubes by doping B/N pair with suitable concentration and the novel characteristics are potentially useful in future applications.

  16. Growth of boric acid crystallites on the surface of boron-doped silicon carbide samples

    International Nuclear Information System (INIS)

    White crystallites were visually observed on fractured or polished surfaces of SiC samples (grain sizes below ∼500 nm) during exposure to air at room temperature for several days. Characterization of the crystallites by scanning electron microscopy, secondary ion mass spectroscopy, and X-ray diffraction identified B(OH)3 crystals with a strong (002) texture. The rate of boric acid formation was determined by a gravimetric experiment. The rate of weight gain increased significantly after an incubation period of 1 week. Nucleation is initially the rate-limiting process. Subsequently small B(OH)3 crystals form on the surface, whose growth rate is determined by grain boundary diffusion of boron to the SiC surface. An estimated grain boundary boron to the SiC surface. An estimated grain boundary diffusion coefficient of boron in SiC was many orders of magnitude higher than extrapolated literature values

  17. Nanoscale control of rewriteable doping patterns in pristine graphene/boron nitride heterostructures

    OpenAIRE

    Velasco Jr., Jairo; Ju, Long; Wong, Dillon; Kahn, Salman; Lee, Juwon; Tsai, Hsin-Zon; Germany, Chad; Wickenburg, Sebastian; Lu, Jiong; Taniguchi, Takashi; Watanabe, Kenji; Zettl, Alex; Wang, Feng; Crommie, Michael F.

    2016-01-01

    Nanoscale control of charge doping in two-dimensional (2D) materials permits the realization of electronic analogs of optical phenomena, relativistic physics at low energies, and technologically promising nanoelectronics. Electrostatic gating and chemical doping are the two most common methods to achieve local control of such doping. However, these approaches suffer from complicated fabrication processes that introduce contamination, change material properties irreversibly, and lack flexible ...

  18. Electronic structure of boron-doped diamond with B–H complex and B pair

    Directory of Open Access Journals (Sweden)

    Tamio Oguchi

    2008-01-01

    Full Text Available The electronic structure of boron–hydrogen complex and boron pair in diamond are studied by first-principles density-functional calculations with supercell models. The electronic structure calculated for the B–H complexes with C2v or C3v symmetry and the nearest-neighbor B pair is used to interpret recent experimental results such as B 1s x-ray photoemission spectroscopy, 11B nuclear quadruple resonance and B K-edge x-ray absorption spectroscopy, which cannot be explained solely by the isolated substitutional boron.

  19. Sensitive voltammetric method for rapid determination of pyridine herbicide triclopyr on bare boron-doped diamond electrode

    International Nuclear Information System (INIS)

    Voltammetric method for the determination of a pyridine herbicide triclopyr (3,5,6-trichloro-2-pyridyloxyacetic acid) is presented for the first time using bare boron-doped diamond electrode. Triclopyr provides one well-developed, pH-independent oxidation signal at ca. +1.9 V (vs. Ag∣AgCl∣KCl (sat.)) contrary to structurally related clopyralid, which is not oxidizable at the working electrode. Britton–Robinson buffer (pH 2.0) was chosen as optimal electrolyte for determination of triclopyr using square wave and differential pulse voltammetry. The latter method provided slightly better detection limit of 0.82 μmol L−1 and linearity in the concentration range 1.0–108.8 μmol L−1. Applicability of the proposed method was verified by analysis of pesticide preparation, spiked water and urine with excellent results

  20. Development of Sensitive Analytical Approach for the Quantification of α-Lipoic Acid Using Boron Doped Diamond Electrode.

    Science.gov (United States)

    Stankovic, Dalibor M; Mehmeti, Eda; Kalcher, Kurt

    2016-01-01

    A boron doped diamond (BDD) electrode was investigated for use as an electrochemical sensor for α-lipoic acid (LA) using amperometric and differential pulse voltammetric detection. LA displays a well expressed oxidation peak at +0.9 V vs. Ag/AgCl in solutions with a pH value of 3. It was found that signals obtained are linearly related to the concentration range from 0.3 to 105 μM with detection limit of 0.088 μM. Interferences by common compounds such as ascorbic acid, uric acid and dopamine were tested and the method was successfully applied to the determination of LA in human body fluids where it gave recoveries in the range from 95 to 97%. PMID:27506710

  1. Electrocatalytic and photocatalytic activity of Pt-TiO2 films on boron-doped diamond substrate

    Science.gov (United States)

    Spătaru, Tanţa; Marcu, Maria; Spătaru, Nicolae

    2013-03-01

    In the present work boron-doped diamond (BDD) polycrystalline films were used as support for direct anodic deposition of hydrous titanium oxide, and continuous TiO2 coatings were obtained by appropriately adjusting the deposition charge. The photoelectrochemical activity of the TiO2/BDD electrodes was investigated and it was found that, in terms of charge carriers separation efficiency, conductive diamond is a much better support for TiO2, compared to traditional carbonaceous materials such as glassy carbon. Further electrochemical deposition of platinum particles on the oxide-coated conductive diamond enabled the formation of a composite with enhanced electrochemically active surface area. The electrocatalytic and photocatalytic properties of the Pt/TiO2/BDD electrodes thus obtained were also scrutinized and it appeared that these hybrid systems also exhibit promising features for methanol anodic oxidation.

  2. Cathodic and anodic pre-treated boron doped diamond with different sp2 content: Morphological, structural, and impedance spectroscopy characterizations

    Science.gov (United States)

    Baldan, M. R.; Azevedo, A. F.; Couto, A. B.; Ferreira, N. G.

    2013-12-01

    In this work, the influence of cathodic (Red) and anodic (Ox) pre-treatment on boron doped diamond (BDD) films grown with different sp2/sp3 ratios was systematically studied. The sp2/sp3 ratios were controlled by the addition of CH4 of 1,3,5 and 7 sccm in the gas inlet during the growth process. The electrodes were treated in 0.5 mol L-1 H2SO4 at -3 and 3 V vs Ag/AgCl, respectively, for 30 min. The electrochemical response of BDD films was investigated using electrochemical impedance spectroscopy (EIS) and Mott-Schottky Plot (MSP) measurements. Four film sample sets were produced in a hot filament chemical vapor deposition reactor. During the growth process, an additional H2 line passing through a bubbler containing the B2O3 dissolved in methanol was used to carry the boron. The scanning electron microscopy morphology showed well faced films with a small decrease in their grain size as the CH4 concentration increased. The Raman spectra depicted a pronounced sp2 band, mainly for films with 5 and 7 sccm of CH4. MSP showed a decrease in the acceptor concentration as the CH4 increased indicating the CH4 influence on the doping process for Red-BDD and Ox-BDD samples. Nonetheless, an apparent increase in the acceptor concentrations for both Ox-BDD samples was observed compared to that for Red-BDD samples, mainly attributed to the surface conductive layer (SCL) formation after this strong oxidation process. The EIS Nyquist plots for Red-BDD showed a capacitance increase for the films with higher sp2 content (5 and 7 sccm). On the other hand, the Nyquist plots for Ox-BDD can be described as semicircles near the origin, at high frequencies, where their charge transfer resistance strongly varied with the sp2 increase in such films.

  3. Effect of reaction conditions on methyl red degradation mediated by boron and nitrogen doped TiO2

    Science.gov (United States)

    Galenda, A.; Crociani, L.; Habra, N. El; Favaro, M.; Natile, M. M.; Rossetto, G.

    2014-09-01

    Nowadays the employment of renewable and sustainable energy sources, and solar light as main option, becomes an urgent need. Photocatalytic processes received great attention in wastewater treatment due to their cheapness, environmental compatibility and optimal performances. Despite the general low selectivity of the photocatalysts, an accurate optimisation of the operational parameters needs to be carried out in order to maximise the process yield. Because of this reason, the present contribution aims to deepen either the knowledge in boron and/or nitrogen doped TiO2-based systems and their employment in methyl red removal from aqueous solutions. The samples were obtained by coprecipitation and characterised by XRD, SEM, BET specific surface area, UV-vis and XPS techniques. The catalytic activity was for the first time carefully evaluated with respect to methyl red photodegradation in different conditions as a function of working pH, counter-ions and pre-adsorption time. An ad-hoc study was performed on the importance of the pre-adsorption of the dye, suggesting that an extended adsorption is useless for the catalyst photoactivity, while a partial coverage is preferable. The photocatalytic tests demonstrate the positive influence of boron doping in photo-activated reactions and the great importance of the operational parameters with respect to the simple methyl red bleaching rather than the overall pollutant mineralisation. It is proved, indeed, that different working pH, acidifying means and substrate pre-adsorption time can enhance or limit the catalyst performances with respect to the complete pollutant degradation rather than its partial breakage.

  4. Photoluminescence and Raman Spectroscopy Characterization of Boron- and Nitrogen-Doped 6H Silicon Carbide

    DEFF Research Database (Denmark)

    Ou, Yiyu; Jokubavicius, Valdas; Liu, Chuan;

    2012-01-01

    in an increased luminescence. A dopant concentration difference larger than 4x1018 cm-3 is proposed to achieve intense photoluminescence. Raman spectroscopy further confirmed the doping type and concentrations for the samples. The results indicate that N-B doped SiC is being a good wavelength converter in white...

  5. Control of Rewriteable Doping Patterns in Graphene/Boron Nitride Heterostructures

    Science.gov (United States)

    Kahn, Salman; Velasco, Jairo, Jr.; Wong, Dillon; Lee, Juwon; Tsai, Hsin Zon; Ju, Long; Jiang, Lili; Shi, Zhiwen; Ashby, Paul; Taniguchi, Takashi; Watanabe, Kenji; Zettl, Alex; Wang, Feng; Crommie, Michael

    Spatial control of charge doping in 2D materials is a promising technique for designing future electronic devices and understanding novel physics. Electrostatic gating and chemical doping are common methods to achieve control of charge doping in 2D materials. However, these approaches suffer from complicated fabrication processes that introduce impurities, change material properties irreversibly, and lack flexibility. Here, we introduce a new method for patterning rewriteable doping profiles with local interface charge transfer from defects in a tunable BN substrate into an adjacent layer of graphene. We characterize these spatial doping patterns through local probe and transport techniques. This technique enables many novel device designs for 2D materials, including atomically thin p-n junctions and rewriteable memory devices.

  6. Theoretical study of interaction between Tacrine and finite-length Al-doped Carbon and Boron nitride Nanotubes: A Semiempirical drug delivery study in thermodynamic view

    Directory of Open Access Journals (Sweden)

    Nasrin Zeighami

    2014-12-01

    Full Text Available In order to extend our previous theoretical calculations that dealt with the thermochemistry of doping the single walled boron nitride nano tubes, BNNTs, and carbon nanotubes ,CNTs, with alminium atoms [1], we have used the AM 1, PM 3, and PM 6 semiempirical methods to investigate the interaction of the tacrine molecule (a drug for the treatment of Alzheimer's disease with the side-walls of aluminum doped boron nitride and carbon nano tubes in thermodynamic views.At first, the frequency calculations were carried out to confirm the stability of the involved structures. In addition, the theoretical thermodynamic study of tacrine adsorption onto the considered nanotubes was performed and the thermodynamic functions such as enthalpy changes, entropy changes and Gibbs free energy changes of the adsorption process were evaluated at different temperatures. Our results suggest the aluminum doped boron nitride nano tubes and alminium doped carbon nano tubes may be considered as the proper carries for the drug delivery of tacrine.

  7. Boron-Doped Graphene As Active Electrocatalyst For Oxygen Reduction Reaction At A Fuel-Cell Cathode

    CERN Document Server

    Fazio, Gianluca; Di Valentin, Cristiana

    2016-01-01

    Boron-doped graphene was reported to be the best non-metal doped graphene electrocatalyst for the oxygen reduction reaction (ORR) working at an onset potential of 0.035 V [JACS 136 (2014) 4394]. In the present DFT study, intermediates and transition structures along the possible reaction pathways are determined. Both Langmuir-Hinschelwood and Eley-Rideal mechanisms are discussed. Molecular oxygen binds the positively charged B atom and forms an open shell end-on dioxygen intermediate. The associative path is favoured with respect to the dissociative one. The free energy diagrams along the four-reduction steps are investigated with the methodology by N{\\o}rskov and co. [JPC B 108 (2004) 17886] in both acidic and alkaline conditions. The pH effect on the stability of the intermediates of reduction is analyzed in terms of the Pourbaix diagram. At pH = 14 we compute an onset potential value for the electrochemical ORR of U = 0.05 V, which compares very well with the experimental value in alkaline conditions.

  8. Tuning electronic properties of carbon nanotubes by Boron and Nitrogen doping

    Science.gov (United States)

    Chegel, Raad

    2016-10-01

    The electronic properties of pure and doped carbon nanotubes and NC3-, BC3-, NC- and BC-nanotubes are investigated by using tight binding theory. It was found that applying the external fields and doping change the band gap. The energy gap is reduced by B/N-doping and the reduction value is sensitive to the several parameters such as nanotube diameter and chirality, external field strength, electric field direction, impurity type and concentration. The direct N (B) substitution creates a new band above (below) the Fermi level and leads to creation of n-type (p-type) semiconductor. The external fields modify the band structure and convert the doped nanotube into metal. For both XC and XC3 nanotubes (X=B/N), the gap energy reduction shows identical dependence to electric field and the XC3 nanotubes show more sensitive behavior to electric field rather than XC nanotubes.

  9. Effects of heat-treatments on electrical properties of boron-doped silicon crystals

    OpenAIRE

    Kamiura, Y.; Hashimoto, F.; Yoneta, M.

    1990-01-01

    The effects of heat-treatments around 1000°Cand subsequent annealing on the electrical properties of boron-dopedsilicon have been studied by electrical conductivity, Hall effect, and deep-level transient spectroscopy measurements. Thehigh-temperature heat-treatments always induced net densities of donors. Four recovery stages, stages I-IV, of heat-treatment-induced donors were observed on isochronal annealing up to 400°C Conductivity changes in these stages can be explainedas described below ...

  10. Electro-Explosive Doping of VT6 Titanium Alloy Surface by Boron Carbide

    Science.gov (United States)

    Kobzareva, T. Yu; Gromov, V. E.; Ivanov, Yu F.; Budovskkh, E. A.; Konovalov, S. V.

    2016-09-01

    The studies carried out in this work target detection of changes in the surface layer of titanium alloy VT6 after electro-explosive alloying (EEA) by boron carbide. EEA of VT6 titanium alloy surface is the plasma alloying formed during the electric explosion of foil with the sample powder of boron carbide. Carbon fibers with weight 140 mg were used as an explosive conductor. Sample powder of boron carbide B4C was placed in the area of explosion on the carbon fibers. It was revealed that EEA of the surface layers of titanium alloy samples VT6 leads to the modification of the layer, thickness of which changes from 10 pm to 50 pm. Heterogeneous distribution of alloying elements was found in the treatment zone by the methods of X-ray microanalysis. A significant difference in their concentration in the identified layers leads to difference in their structural and tribological behaviour. It was revealed that after electro-explosive alloying the microhardness of titanium alloy VT6 significantly increases. Electro-explosive alloying leads to the formation of a structure of submicro- and nano-scale level. It allows strength and tribological properties of the treated surface to be increased.

  11. Boron Doped Nanocrystalline Film with Improved Work Function as a Buffer Layer in Thin Film Silicon Solar Cells.

    Science.gov (United States)

    Park, Jinjoo; Shin, Chonghoon; Park, Hyeongsik; Jung, Junhee; Lee, Youn-Jung; Bong, Sungjae; Dao, Vinh Ai; Balaji, Nagarajan; Yi, Junsin

    2015-03-01

    We investigated thin film silicon solar cells with boron doped hydrogenated nanocrystalline silicon/ hydrogenated amorphous silicon oxide [p-type nc-Si:H/a-SiOx:H] layer. First, we researched the bandgap engineering of diborane (B2H6) doped wide bandgap hydrogenated nanocryslline silicon (p-type nc-Si:H) films, which have excellent electrical properties of high dark conductivity, and low activation energy. The films prepared with lower doping ratio and higher hydrogen dilution ratio had higher optical gap (Eg), with higher dark conductivity (σ(d)), and lower activation energy (Ea). We controlled Eg from 2.10 eV to 1.75 eV, with σ(d) from 1.1 S/cm to 7.59 x 10(-3) S/cm, and Ea from 0.040 eV to 0.128 eV. Next, we focused on the fabrication of thin film silicon solar cells. By inserting p-type nc-Si:H film into the thin film silicon solar cells, we achieved a remarkable increase in the built-in potential from 0.803 eV to 0.901 eV. By forming p-type nc-Si:H film between SnO2:F/ZnO:Al (30 nm) and p-type a-SiOx:H layer, the solar cell properties of open circuit voltage (Voc), short circuit current density (Jsc), and efficiency (η) were improved by 3.7%, 9.2%, and 9.8%, respectively. PMID:26413646

  12. Preparation of boron-doped TiO{sub 2} films by autoclaved-sol method at low temperature and study on their photocatalytic activity

    Energy Technology Data Exchange (ETDEWEB)

    Lu Xiaona; Tian Baozhu; Chen Feng [Key Laboratory for Advanced Materials and Institute of Fine Chemicals, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237 (China); Zhang Jinlong, E-mail: jlzhang@ecust.edu.c [Key Laboratory for Advanced Materials and Institute of Fine Chemicals, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237 (China); School of Chemistry and Materials Science, Guizhou Normal University, Guiyang 550001 (China)

    2010-10-29

    A series of uniform and transparent boron-doped TiO{sub 2} films were synthesized from autoclaved-sol without organic solvent at low temperature. As-prepared B-TiO{sub 2} films with two layers were characterized by XRD, DRS, XPS and AFM. The photocatalytic characteristics were measured based on the degradation of Rhodamine B (RhB) solution under visible or UV light. The results indicated that the anatase phase was the main crystal form of the films, containing a small amount of brookite. The presence of boron caused a red shift in the absorption band of TiO{sub 2} films. The doped boron was mainly presented in the form of B{sub 2}O{sub 3}, O-Ti-B and O-Ti-B bonds, confirming that autoclaved-sol synthesis at low temperature allowed for incorporation of boron atoms into the TiO{sub 2} matrix. Transmission of the films was about 90% in the visible region. The 10% (atom) B-TiO{sub 2} film exhibited the best photocatalytic activity both in visible and UV light.

  13. Adsorption of diazinon and hinosan molecules on the iron-doped boron nitride nanotubes surface in gas phase and aqueous solution: A computational study

    Science.gov (United States)

    Farmanzadeh, Davood; Rezainejad, Hamid

    2016-02-01

    In this study, the geometric structures and electronic properties of two widely used organophosphorus pesticides, diazinon and hinosan, boron nitride nanotubes (BNNTs) and Fe doped boron nitride nanotubes (FeBNNTs) as adsorbents of these pesticides are studied by density functional theory calculation as well as dispersion correction by Grimme method. The results show that Fe doping in boron nitride nanotubes structures increases the potency of nanotubes to adsorb mentioned pesticides, especially when Fe atom located instead of N atom. Comparing the adsorption energies of diazinon on FeBNNTs with ones for hinosan demonstrate that the adsorption of hinosan is energetically more favorable by FeBNNTs. Assessment of adsorption energies in aqueous solution confirmed significant decrease in their values compared to ones in gaseous phase. However, the adsorption of diazinon and hinosan on both BNNTs and FeBNNTs are exothermic. So, BNNTs and FeBNNTs may be promising candidates as appropriate adsorbents for adsorbing diazinon and hinosan. Also, the results of calculations have revealed that van der Waals interaction energies are remarkably large in adsorption of diazinon and hinosan on all boron nitride nanotubes.

  14. Electrochemical oxidation using a boron doped diamond electrode as a water treatment process- removal of residual micropollutants and inac-tivation of microorganisms

    OpenAIRE

    Rajab, Mohamad Dib

    2015-01-01

    A boron doped diamond electrode was tested for the removal of micropollutants and inactivation of microorganisms. The results showed that higher current densities accelerated the degradation process, whereas an increase in water complexity decelerated it. A current density between 100-200 mA cm-2 would completely remove micropollutants and limit the formation of inorganic by-products. A synergic effect of reactive oxygen and chlorine species assured the disinfection capability of the electrod...

  15. Effective performance for undoped and boron-doped double-layered nanoparticles-copper telluride and manganese telluride on tungsten oxide photoelectrodes for solar cell devices.

    Science.gov (United States)

    Srathongluan, Pornpimol; Vailikhit, Veeramol; Teesetsopon, Pichanan; Choopun, Supab; Tubtimtae, Auttasit

    2016-11-01

    This work demonstrates the synthesis of a novel double-layered Cu2-xTe/MnTe structure on a WO3 photoelectrode as a solar absorber for photovoltaic devices. Each material absorber is synthesized using a successive ionic layer adsorption and reaction (SILAR) method. The synthesized individual particle sizes are Cu2-xTe(17) ∼5-10nm and MnTe(3) ∼2nm, whereas, the aggregated particle sizes of undoped and boron-doped Cu2-xTe(17)/MnTe(11) are ∼50 and 150nm, respectively. The larger size after doping is due to the interconnecting of nanoparticles as a network-like structure. A new alignment of the energy band is constructed after boron/MnTe(11) is coated on boron/Cu2-xTe nanoparticles (NPs), leading to a narrower Eg equal to 0.58eV. Then, the valence band maximum (VBM) and conduction band minimum (CBM) with a trap state are also up-shifted to near the CBM of WO3, leading to the shift of a Fermi level for ease of electron injection. The best efficiency of 1.41% was yielded for the WO3/boron-doped [Cu2-xTe(17)/MnTe(11)] structure with a photocurrent density (Jsc)=16.43mA/cm(2), an open-circuit voltage (Voc)=0.305V and a fill factor (FF)=28.1%. This work demonstrates the feasibility of this double-layered structure with doping material as a solar absorber material. PMID:27451035

  16. A comparative study of electrochemical oxidation of methidation organophosphorous pesticide on SnO2 and boron-doped diamond anodes

    OpenAIRE

    Hachami, Fatima; Errami, Mohamed; Bazzi, Lahcen; Hilali, Mustapha; Salghi, Rachid; Jodeh, Shehdeh; Hammouti, Belkheir; Hamed, Othman A.

    2015-01-01

    Background Electrochemical oxidation considered to be among the best methods in waste water desalination and removing toxic metals and organic pesticides from wastewater like Methidathion. The objective of this work is to study the electrochemical oxidation of aqueous wastes containing Methidathion using boron doped diamond thin-film electrodes and SnO2, and to determine the calculated partial charge and frontier electron density parameters. Results Electrolysis parameters such as current den...

  17. Preparation of grain size controlled boron-doped diamond thin films and their applications in selective detection of glucose in basic solutions

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    Boron-doped diamond (BDD) thin films with different crystal grain sizes were prepared by controlling the reacting gas pressure using hot filament chemical vapor deposition (HFCVD).The morphologies and structures of the prepared diamond thin films were characterized by scanning electron microscopy (SEM) and Raman spectroscopy.The electrochemical responses of K4Fe(CN)6 on different BDD electrodes were investigated.The results suggested that electron transfer was faster at the boron-doped nanocrystalline diamond (BDND) thin film electrodes in comparison with that at other BDD thin film electrodes.The prepared BDD thin film electrodes without any modification were used to directly detect glucose in the basic solution.The results showed that the as-prepared BDD thin film electrodes exhibited good selectivity for detecting glucose in the presence of ascorbic acid (AA) and uric acid (UA).The higher sensitivity was observed on the BDND thin film grown on the boron-doped microcrystalline diamond (BDMD) thin film surface,and the linear response range,sensitivity and the low detection limit were 0.25–10 mM,189.1 μA mmol-1 cm-2 and 25 μM (S/N=3) for glucose in the presence of AA and UA,respectively.

  18. Studies on distribution of element contents in transient layer at interface between boron-doped diamond film electrode and tantalum substrate

    International Nuclear Information System (INIS)

    The boron-doped diamond film (BDD) grown on tantalum (Ta) substrate as an electrode (BDD/Ta) was prepared by hot filament chemical vapor deposition method. The experimental results demonstrated that our BDD/Ta had high current efficiency, strong ability to degrade wastewater, good corrosion stability and long lifetime. These excellent characteristics of BDD/Ta have been explained in terms of Rutherford backscattering (RBS) experiments. RBS investigation revealed that the continuous transient layer at the interface between boron-doped diamond film and Ta-substrate was formed and the microstructure of the continuous transient layer given by the continuous distribution of all element contents at the interface was obtained. The thicknesses of boron-doped diamond film and the continuous transient layer were about equal to 8000 x 1015 atoms/cm2 and 5800 x 1015 atoms/cm2, respectively. The formation of the continuous transient layer at the interface can eliminate the mismatch of thermal expansion coefficients (TEC) at the interface and only lead to the slow change of TEC because of the continuous distribution of element contents of the film and substrate in the transient layer at the interface. Thus, there is no residual stress to concentrate on the interface and the stress-corrosion delamination of the film disappears. Therefore, the corrosion stability and lifetime of BDD/Ta increase and last well, that have been verified by X-ray diffraction (XRD) experiments.

  19. Studies on distribution of element contents in transient layer at interface between boron-doped diamond film electrode and tantalum substrate

    Energy Technology Data Exchange (ETDEWEB)

    Liang Jiachang, E-mail: jcliang@cauc.edu.cn [College of Science, Civil Aviation University of China, Jin Bei highway No.2898, Southern campus of Civil Aviation, Tianjin 300300 (China); Gao Chengyao [Chinese People' s Armed Police Forces Academy, Langfang, Hebei 065000 (China); Zhang Liping [College of Science, Civil Aviation University of China, Jin Bei highway No.2898, Southern campus of Civil Aviation, Tianjin 300300 (China); Jiang Lihui [Tianjin Key Laboratory for Advanced Signal Processing, Civil Aviation University of China, Tianjin 300300 (China); Yang Zhengquan; Wang Zhiping; Ji Chaohui [College of Science, Civil Aviation University of China, Jin Bei highway No.2898, Southern campus of Civil Aviation, Tianjin 300300 (China); Le Xiaoyun; Rong Cuihua [School of Physics and Nuclear Energy Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083 (China); Zhang Jian [Hainan Airlines Group, Hainan 570206 (China)

    2011-05-01

    The boron-doped diamond film (BDD) grown on tantalum (Ta) substrate as an electrode (BDD/Ta) was prepared by hot filament chemical vapor deposition method. The experimental results demonstrated that our BDD/Ta had high current efficiency, strong ability to degrade wastewater, good corrosion stability and long lifetime. These excellent characteristics of BDD/Ta have been explained in terms of Rutherford backscattering (RBS) experiments. RBS investigation revealed that the continuous transient layer at the interface between boron-doped diamond film and Ta-substrate was formed and the microstructure of the continuous transient layer given by the continuous distribution of all element contents at the interface was obtained. The thicknesses of boron-doped diamond film and the continuous transient layer were about equal to 8000 x 10{sup 15} atoms/cm{sup 2} and 5800 x 10{sup 15} atoms/cm{sup 2}, respectively. The formation of the continuous transient layer at the interface can eliminate the mismatch of thermal expansion coefficients (TEC) at the interface and only lead to the slow change of TEC because of the continuous distribution of element contents of the film and substrate in the transient layer at the interface. Thus, there is no residual stress to concentrate on the interface and the stress-corrosion delamination of the film disappears. Therefore, the corrosion stability and lifetime of BDD/Ta increase and last well, that have been verified by X-ray diffraction (XRD) experiments.

  20. Effects of glucose doping on the MgB2 superconductors using cheap crystalline boron

    Science.gov (United States)

    Parakkandy, Jafar Meethale; Shahabuddin, Mohammed; Shah, M. Shahabuddin; Alzayed, Nasser S.; Qaid, Salem A. S.; Madhar, Niyaz Ahmad; Ramay, Shahid M.; Shar, Muhammad Ali

    2015-12-01

    We report the effect of glucose (C6H12O6) doping on the structural and electromagnetic properties of MgB2 superconductor fabricated by dry mixing using planetary ball milling. Herein, as-prepared bulk polycrystalline Mg (B1-xCx) 2 samples with different doping levels (x = 0, 2, 4, and 6 at. %) were systematically studied by X-ray diffraction, magnetic and resistivity measurements, and microstructure analysis. When carbon doped, the reduction in critical transition temperature and shrinkage in a-lattice were obviously observed. This resulted in structural distortion of the MgB2 lattice, and thereby, enhanced an impurity scattering. In addition to these, upper critical field and high-field critical current densities were also enhanced. On the other hand, both pinning force and low-field critical current density are decreased. The high field enhancement and low field degradation are due to increase in impurity scattering and decrease in pinning force respectively.

  1. “Synthesis and properties of Boron doped ZnO thin films by spray CVD technique at low substrate temperature”

    Directory of Open Access Journals (Sweden)

    Sunanda C. Yadav

    2012-12-01

    Full Text Available Intrinsic and nanocrystalline properties of Boron doped ZnO thin films were synthesized with a newly designed spray CVD technique from non-aqueous solution of Zinc acetate [Zn(CH3COOH2] as a precursor solution and Boric Acid as a doping solution. The major benefits of this technique are precise stoichiometry and its ability to deposit vapors on a large surface area with a high uniformity of thickness. The commercialization potential is enhanced by the low deposition temperature. In view for providing thin films as a Transparent Conducting Oxide (TCO for commercial application, the effect of dopant concentration from 0.2 at% to 1 at% in steps of 0.2 has been studied. The crystalline properties of these films have been investigated by X- ray diffraction (XRD technique. The results reveal hexagonal wurtzite structure indicating preferential orientation along caxis. Debye –Scherrer calculation indicate deteriorated crystallinity induced by Boron doping. The results are inwell agreement with surface morphology of film analyzed with Field Emission Scanning Micrographs and topography of films characterized with AFM. Moreover, the Boron doping enhances optoelectronic properties. The average optical transmittance of films increases with doping concentration showing maximum transparency for 0.8at% doping concentration (≈90%. The transmittance curve indicates interference fringe pattern between the wave fronts generated at the two interfaces (air and substrate. The extinction coefficient of the films is nearly equal to zero which suggests there is no absorption of light at grain boundary. Boron doping results blue shifted optical band gap resulted with reduced particle size. Nevertheless, refractive index and absorption edge of the ZnO films are similar to that of single crystal ZnO. The significant effect indicating enhanced electrical conductivity of the ZnO film is observed for the optimized B dopant concentration (0.8 at %. The films obtained at

  2. 硼掺杂对石墨烯量子点发光影响的理论研究%Theoretical Study of the Fluorescence of Graphene Quantum Dots Doped by Boron

    Institute of Scientific and Technical Information of China (English)

    杨丽君

    2016-01-01

    The absorption and emission spectra of graphene quantum dots (GQDs)and boron-doped GQDs were ex-plored by TDDFT method.The calculated results indicate that the doped boron atom can make a high redshift of ab-sorption and emission wavelength of GQDs.The doped boron atom located at the edge of GQDs makes higher red-shift.The doped-boron atom also greatly decreases the absorption and emission intensity of GQDs,which is inde-pendent of the position of boron atom.The molecular orbitals of GQDs and boron-doped GQDs were analyzed.The transition is charge transfer (CT)when boron locates at the edge of GQDs,which is different from the local excita-tion (LE)of GQDs with interior doped boron.%采用含时密度泛函(TDDFT)方法研究了石墨烯量子点(GQDs)和硼掺杂 GQDs 的吸收和发射光谱。计算结果表明,硼掺杂使 GQDs 的吸收和发射光波长红移,硼的位置越靠近 GQDs 边缘,波长红移越多。硼掺杂极大地降低了 GQDs 的吸收和发射光强度,这与掺杂时硼的位置无关。轨道分析表明,硼掺杂在边缘时,GQDs 中电子跃迁的类型为电荷转移跃迁,与硼掺杂在晶格内的局域激发不同。

  3. Phosphorus- and boron-doped hydrogenated amorphous silicon films prepared using vaporized liquid cyclopentasilane

    Energy Technology Data Exchange (ETDEWEB)

    Masuda, Takashi, E-mail: mtakashi@jaist.ac.jp [Japan Advanced Institute of Science and Technology, Nomi, Ishikawa, 923-1292 (Japan); Takagishi, Hideyuki; Shen, Zhongrong; Ohdaira, Keisuke; Shimoda, Tatsuya [Japan Advanced Institute of Science and Technology, Nomi, Ishikawa, 923-1292 (Japan); Japan Science and Technology Agency, ALCA, Nomi, Ishikawa, 923-1211 (Japan)

    2015-08-31

    A simple, inexpensive method for fabricating a hydrogenated amorphous silicon (a-Si:H) film using thermal chemical vapor deposition from cyclopentasilane (CPS) at atmospheric pressure with a substrate temperature of 370 °C is described. The reactant gas was generated from liquid CPS by vaporization in the deposition chamber. The vaporized CPS gas was transformed immediately into a-Si:H film on a heated substrate. The a-Si:H films could be doped either n- or p-type by dissolving appropriate amounts of white phosphorus or decaborane, respectively, in the liquid CPS before vaporization. This process allows deposition of doped a-Si:H films of photovoltaic device-quality without the need for handling, storage, or transportation of large amounts of gaseous reactants. - Highlights: • B and P doped a-Si:H films made from liquid materials is presented. • Decaborane and white phosphorus is dissolved in the liquid materials. • A simple, inexpensive method for fabricating a-Si:H films using non-vacuum process. • The doped a-Si:H films with usable quality for photovoltaic devices are deposited.

  4. Boron and aluminium doping in SiC and its passivation by hydrogen

    Energy Technology Data Exchange (ETDEWEB)

    Deak, Peter; Aradi, Balint; Gali, Adam [Budapest University of Technology and Economics, Department of Atomic Physics, Budapest (Hungary)]. E-mail: p.deak@eik.bme.hu

    2001-10-08

    Extensive calculations regarding the formation energy of interstitial hydrogen and hydrogen-vacancy complexes in different charge states have been carried out using the local density approximation to ab initio density functional theory with a plane-wave basis and norm-conserving pseudopotentials on supercells of cubic (3C) SiC. Based on these results the hydrogen concentration of as-grown or H-plasma treated SiC is estimated and its effect on the net carrier concentration is given. Incorporation of B and Al in or without the presence of hydrogen has been investigated in hexagonal (4H) SiC supercells. The possible origins of the shallow and deep boron acceptors is discussed. It is found that the presence of boron promotes hydrogen incorporation during growth in the form of passive B+H complexes. The same is not true for Al. If Al+H complexes are formed (say, after H-plasma treatment), the structure of this complex is different from that of the B+H complexes. The calculated difference between the dissociation energies is 0.9 eV. (author)

  5. Optical Properties and Boron Doping-Induced Conduction-Type Change in SnO2 Thin Films

    Science.gov (United States)

    Tran, Quang-Phu; Fang, Jau-Shiung; Chin, Tsung-Shune

    2016-01-01

    Boron-doped tin oxide (BTO) films, 0-5 at.% B, were prepared by sol-gel dip coating on a glass substrate. Dried precursor films were post-annealed at a temperature between 400°C and 750°C for 2 h. The obtained BTO thin films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet-visible light (UV-Vis) spectrometry, a four-point probe, and Hall-effect and Seebeck-effect measurements. Optimal optical transmittance was achieved for post-annealed BTO thin film at 700°C. XRD results show a rutile SnO2 structure with a preferred (110) orientation for all the films. The grain size is 47-21 nm, which reduces with increasing B contents. The optical transmittance is 84.6-88.5% at a wavelength of 550 nm and optical band gap of 3.52-3.75 eV. Electrical resistivity is (3.4-8.2) × 10-3 Ω cm, and figure of merit (0.9-4.3) × 10-3 Ω-1. Carrier concentration is (0.97-7.4) × 1020 cm-3 and mobility (2.5-7.8) cm2 V-1 s-1. BTO film with 4 at.% B shows an optimal combination of properties. Conduction type changes from n- (undoped) to p- (1-4 at.% B), then to n-types (5 at.% B), as evidenced from Hall-effect and Seebeck-effect measurements. This is explained by doping-generated defects and phase separations of Sn3O4 and B2O3.

  6. Effect of Polishing on the Friction Behaviors and Cutting Performance of Boron-Doped Diamond Films on WC-Co Inserts

    Science.gov (United States)

    Wang, Liang; Shen, Bin; Sun, Fanghong; Zhang, Zhiming

    2014-04-01

    Boron doped (B-doped) diamond films are deposited onto WC-Co inserts by HFCVD with the mixture of acetone, trimethyl borate (C3H9BO3) and H2. The as-deposited B-doped diamond films are characterized with scanning electron microscope (SEM), X-ray diffraction (XRD) spectroscopy, Raman spectroscopy, 3D surface topography based on white-light interferometry and Rockwell hardness tester. The effects of mechanical polishing on the friction behavior and cutting performance of B-doped diamond are evaluated by ball-on-plate type reciprocating tribometer and turning of aluminum alloy 7075 materials, respectively. For comparison, the same tests are also conducted for the bare WC-Co inserts with smooth surface. Friction tests suggest that the unpolished and polished B-doped diamond films possess relatively low fluctuation of friction coefficient than as-received bare WC-Co samples. The average stable friction coefficient for B-doped diamond films decreases apparently after mechanical polishing. The values for WC-Co sample, unpolished and polished B-doped diamond films are approximately 0.38, 0.25 and 0.11, respectively. The cutting results demonstrate that the low friction coefficient and high adhesive strength of B-doped diamond films play an essential role in the cutting performance enhancement of the WC-Co inserts. However, the mechanical polishing process may lower the adhesive strength of B-doped diamond films. Consequently, the polished B-doped diamond coated inserts show premature wear in the machining of adhesive aluminum alloy materials.

  7. Influences of H+ Implantation on the Boron-Doped Synthesized by Chemical Vapor Deposition Diamond Films

    Institute of Scientific and Technical Information of China (English)

    WANG Shuang-Bao

    2000-01-01

    Diamond films (DF) were preliminarily B doped in situ during chemical vapor deposition. Subsequently, the films were implanted with 120keV H+ to dose of 5 × 1014 ~ 5 × 1016cm-2. After the implantation, the B doped DF become insulating and Raman measurements indicate that the implantation has amorphous carbon and graphite etched. It is known that the formation of H-B pairs plays an important pole in property changes. However, for larger dose cases, the electrical resistance of DF is influenced by radiation damage and/or non-diamond phases. In addition to them, annealing makes the specimens conducting again. This phenomenon maybe has potential for application in designing DF device.

  8. Lithium decoration of three dimensional boron-doped graphene frameworks for high-capacity hydrogen storage

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Yunhui; Meng, Zhaoshun; Liu, Yuzhen; You, Dongsen; Wu, Kai; Lv, Jinchao; Wang, Xuezheng; Deng, Kaiming; Lu, Ruifeng, E-mail: dewei@ujs.edu.cn, E-mail: rflu@njust.edu.cn [Department of Applied Physics, Nanjing University of Science and Technology, Nanjing 210094 (China); Rao, Dewei, E-mail: dewei@ujs.edu.cn, E-mail: rflu@njust.edu.cn [Institute for Advanced Materials, Jiangsu University, Zhenjiang 212013 (China)

    2015-02-09

    Based on density functional theory and the first principles molecular dynamics simulations, a three-dimensional B-doped graphene-interconnected framework has been constructed that shows good thermal stability even after metal loading. The average binding energy of adsorbed Li atoms on the proposed material (2.64 eV) is considerably larger than the cohesive energy per atom of bulk Li metal (1.60 eV). This value is ideal for atomically dispersed Li doping in experiments. From grand canonical Monte Carlo simulations, high hydrogen storage capacities of 5.9 wt% and 52.6 g/L in the Li-decorated material are attained at 298 K and 100 bars.

  9. Sintering of nano crystalline silicon carbide by doping with boron carbide

    Indian Academy of Sciences (India)

    M S Datta; A K Bandyopadhyay; B Chaudhuri

    2002-06-01

    Sinterable nano silicon carbide powders of mean particle size (37 nm) were prepared by attrition milling and chemical processing of an acheson type alpha silicon carbide having mean particle size of 0.39 m (390 nm). Pressureless sintering of these powders was achieved by addition of boron carbide of 0.5 wt% together with carbon of 1 wt% at 2050°C at vacuum (3 mbar) for 15 min. Nearly 99% sintered density was obtained. The mechanism of sintering was studied by scanning electron microscopy and transmission electron microscopy. This study shows that the mechanism is a solid-state sintering process. Polytype transformation from 6H to 4H was observed.

  10. Highly sensitive detection of influenza virus by boron-doped diamond electrode terminated with sialic acid-mimic peptide.

    Science.gov (United States)

    Matsubara, Teruhiko; Ujie, Michiko; Yamamoto, Takashi; Akahori, Miku; Einaga, Yasuaki; Sato, Toshinori

    2016-08-01

    The progression of influenza varies according to age and the presence of an underlying disease; appropriate treatment is therefore required to prevent severe disease. Anti-influenza therapy, such as with neuraminidase inhibitors, is effective, but diagnosis at an early phase of infection before viral propagation is critical. Here, we show that several dozen plaque-forming units (pfu) of influenza virus (IFV) can be detected using a boron-doped diamond (BDD) electrode terminated with a sialic acid-mimic peptide. The peptide was used instead of the sialyloligosaccharide receptor, which is the common receptor of influenza A and B viruses required during the early phase of infection, to capture IFV particles. The peptide, which was previously identified by phage-display technology, was immobilized by click chemistry on the BDD electrode, which has excellent electrochemical characteristics such as low background current and weak adsorption of biomolecules. Electrochemical impedance spectroscopy revealed that H1N1 and H3N2 IFVs were detectable in the range of 20-500 pfu by using the peptide-terminated BDD electrode. Our results demonstrate that the BDD device integrated with the receptor-mimic peptide has high sensitivity for detection of a low number of virus particles in the early phase of infection. PMID:27457924

  11. XPS study of ruthenium tris-bipyridine electrografted from diazonium salt derivative on microcrystalline boron doped diamond.

    Science.gov (United States)

    Agnès, Charles; Arnault, Jean-Charles; Omnès, Franck; Jousselme, Bruno; Billon, Martial; Bidan, Gérard; Mailley, Pascal

    2009-12-28

    Boron doped diamond (BDD) functionalization has received an increasing interest during the last few years. Such an infatuation comes from the original properties of BDD, including chemical stability or an electrochemical window, that opens the way for the design of (bio)sensors or smart interfaces. In such a context, diazonium salts appear to be well suited for BDD functionalization as they enable covalent immobilization of functional entities such as enzymes or DNA. In this study we report microcrystalline BDD functionalization with a metallic complex, ruthenium tris(bipyridine), using the p-(tris(bipyridine)Ru(2+))phenyl diazonium salt. Electrografting using cyclic voltammetry (CV) allowed the formation of a ruthenium complex film that was finely characterized using electrochemistry and X-ray photoelectron spectroscopy (XPS). Moreover, we showed that chronopotentiometry (CP) is a convenient tool to monitor Ru complex film deposition through the control of the electrochemical pulse parameters (i.e. current density and pulse duration). Finally, such a control was demonstrated through the correlation between electrochemical and XPS characterizations. PMID:20024438

  12. Photovoltaic devices based on high density boron-doped single-walled carbon nanotube/n-Si heterojunctions

    International Nuclear Information System (INIS)

    A simple and easily processible photovoltaic device has been developed based on borondoped single-walled carbon nanotubes (B-SWNTs) and n-type silicon (n-Si) heterojunctions. The single-walled carbon nanotubes (SWNTs) were substitutionally doped with boron atoms by thermal annealing, in the presence of B2O3. The samples used for these studies were characterized by Raman spectroscopy, thermal gravimetric analysis (TGA), transmission electron microscopy (TEM), and x-ray photoelectron spectroscopy (XPS). The fully functional solar cell devices were fabricated by airbrush deposition that generated uniform B-SWNT films on top of the n-Si substrates. The carbon nanotube films acted as exciton-generation sites, charge collection and transportation, while the heterojunctions formed between B-SWNTs and n-Si acted as charge dissociation centers. The current-voltage characteristics in the absence of light and under illumination, as well as optical transmittance spectrum are reported here. It should be noted that the device fabrication process can be made amenable to scalability by depositing direct and uniform films using airbrushing, inkjet printing, or spin-coating techniques

  13. Monitoring the evolution of boron doped porous diamond electrode on flexible retinal implant by OCT and in vivo impedance spectroscopy.

    Science.gov (United States)

    Hébert, Clément; Cottance, Myline; Degardin, Julie; Scorsone, Emmanuel; Rousseau, Lionel; Lissorgues, Gaelle; Bergonzo, Philippe; Picaud, Serge

    2016-12-01

    Nanocrystalline Boron doped Diamond proved to be a very attractive material for neural interfacing, especially with the retina, where reduce glia growth is observed with respect to other materials, thus facilitating neuro-stimulation over long terms. In the present study, we integrated diamond microelectrodes on a polyimide substrate and investigated their performances for the development of neural prosthesis. A full description of the microfabrication of the implants is provided and their functionalities are assessed using cyclic voltammetry and electrochemical impedance spectroscopy. A porous structure of the electrode surface was thus revealed and showed promising properties for neural recording or stimulation. Using the flexible implant, we showed that is possible to follow in vivo the evolution of the electric contact between the diamond electrodes and the retina over 4months by using electrochemical impedance spectroscopy. The position of the implant was also monitored by optical coherence tomography to corroborate the information given by the impedance measurements. The results suggest that diamond microelectrodes are very good candidates for retinal prosthesis. PMID:27612691

  14. Electrochemical treatment of reverse osmosis concentrate on boron-doped electrodes in undivided and divided cell configurations.

    Science.gov (United States)

    Bagastyo, Arseto Y; Batstone, Damien J; Kristiana, Ina; Escher, Beate I; Joll, Cynthia; Radjenovic, Jelena

    2014-08-30

    An undivided electrolytic cell may offer lower electrochlorination through reduction of chlorine/hypochlorite at the cathode. This study investigated the performance of electrooxidation of reverse osmosis concentrate using boron-doped diamond electrodes in membrane-divided and undivided cells. In both cell configurations, similar extents of chemical oxygen demand and dissolved organic carbon removal were obtained. Continuous formation of chlorinated organic compounds was observed regardless of the membrane presence. However, halogenation of the organic matter did not result in a corresponding increase in toxicity (Vibrio fischeri bioassay performed on extracted samples), with toxicity decreasing slightly until 10AhL(-1), and generally remaining near the initial baseline-toxicity equivalent concentration (TEQ) of the raw concentrate (i.e., ∼2mgL(-1)). The exception was a high range toxicity measure in the undivided cell (i.e., TEQ=11mgL(-1) at 2.4AhL(-1)), which rapidly decreased to 4mgL(-1). The discrepancy between the halogenated organic matter and toxicity patterns may be a consequence of volatile and/or polar halogenated by-products formed in oxidation by OH electrogenerated at the anode. The undivided cell exhibited lower energy compared to the divided cell, 0.25kWhgCOD(-1) and 0.34kWhgCOD(-1), respectively, yet it did not demonstrate any improvement regarding by-products formation.

  15. Development of an electrochemical sensor for the determination of the total antioxidant capacity in berries based on boron doped diamond

    Directory of Open Access Journals (Sweden)

    BRUNA PEKEC

    2013-02-01

    Full Text Available Many antioxidants can be electrochemically oxidized using graphite-based electrodes; nevertheless problems arise due to the strong adsorption of redox species at the sensing area. We have demonstrated that boron doped diamond (BDD electrodes do not show this property, which can be exploited for the design of a new amperometric sensor for the quantification of antioxidants as “total antioxidant capacity” (AOC. As reference substances hydroquinone (HQ and 6-hydroxy-2,5,7,8-tetramethylchromane-2-carboxylic acid (Trolox were studied in more detail. The supporting electrolyte was a phosphate buffer solution (PBS, 0.1 mol/L, pH 7.0. The limits of detection (LOD were 1.5 mg/L and 2.5 mg/L for HQ and Trolox, respectively. The repeatability was 3 % RSD for concentration of 200 mg/L HQ. The method could be applied for the determination of AOC in different berry samples, such as strawberry, blueberry, grape and bramble. A comparison with a standard photometric assay showed good correlation between both methods. The BDD sensor features good reproducibility without fatiguing over at least two months of operation.

  16. Anodic oxidation of ketoprofen-An anti-inflammatory drug using boron doped diamond and platinum electrodes

    International Nuclear Information System (INIS)

    The mineralization of ketoprofen (KP) by anodic oxidation was studied by employing boron doped diamond (BDD) and Pt electrodes. The redox behavior of KP molecule, fouling of electrodes, generation of oxygen and active chlorine species were studied by cyclic voltammetry. The effect of electrolyte, pH of aqueous medium and applied current density on the mineralization behavior of KP was also investigated. The degradation and mineralization were monitored by UV-vis spectrophotometer and total organic carbon analyzer, respectively. The results were explained in terms of in situ generation of hydroxyl radical (·OH), peroxodisulfate (S2O82-), and active chlorine species (Cl2, HOCl, OCl-). The physisorbed ·OH on BDD was observed to trigger the combustion of KP in to CO2 and H2O. The poor mineralization at both BDD and Pt anodes in the presence of NaCl as supporting electrolyte was ascribed to the formation of chlorinated organic compounds which are refractory. Complete mineralization of KP molecule was achieved using Na2SO4 as supporting electrolyte.

  17. Electrochemical disinfection using boron-doped diamond electrode--the synergetic effects of in situ ozone and free chlorine generation.

    Science.gov (United States)

    Rajab, Mohamad; Heim, Carolin; Letzel, Thomas; Drewes, Jörg E; Helmreich, Brigitte

    2015-02-01

    This work investigated the capability of using a boron-doped diamond (BDD) electrode for bacterial disinfection in different water matrices containing varying amounts of chloride. The feed water containing Pseudomonas aeruginosa was electrochemically treated while applying different electrode conditions. Depending on the applied current density and the exposure time, inactivation between 4- and 8-log of the targeted microorganisms could be achieved. The disinfection efficiency was driven by the generation of free chlorine as a function of chloride concentration in the water. A synergetic effect of generating both free chlorine and ozone in situ during the disinfection process resulted in an effective bactericidal impact. The formation of the undesired by-products chlorate and perchlorate depended on the water matrix, the applied current density and the desired target disinfection level. In case of synthetic water with a low chloride concentration (20 mg L(-1)) and an applied current density of 167 mA cm(-2), a 6-log inactivation of Pseudomonas aeruginosa could be achieved after 5 min of exposure. The overall energy consumption ranged between 0.3 and 0.6 kW h m(-3) depending on the applied current density and water chemistry. Electrochemical water disinfection represents a suitable and efficient process for producing pathogen-free water without the use of any chemicals.

  18. Size-Dependent Electrocatalytic Activity of Gold Nanoparticles on HOPG and Highly Boron-Doped Diamond Surfaces

    Directory of Open Access Journals (Sweden)

    Tine Brülle

    2011-12-01

    Full Text Available Gold nanoparticles were prepared by electrochemical deposition on highly oriented pyrolytic graphite (HOPG and boron-doped, epitaxial 100-oriented diamond layers. Using a potentiostatic double pulse technique, the average particle size was varied in the range from 5 nm to 30 nm in the case of HOPG as a support and between < 1 nm and 15 nm on diamond surfaces, while keeping the particle density constant. The distribution of particle sizes was very narrow, with standard deviations of around 20% on HOPG and around 30% on diamond. The electrocatalytic activity towards hydrogen evolution and oxygen reduction of these carbon supported gold nanoparticles in dependence of the particle sizes was investigated using cyclic voltammetry. For oxygen reduction the current density normalized to the gold surface (specific current density increased for decreasing particle size. In contrast, the specific current density of hydrogen evolution showed no dependence on particle size. For both reactions, no effect of the different carbon supports on electrocatalytic activity was observed.

  19. Applicability of boron-doped diamond electrode to the degradation of chloride-mediated and chloride-free wastewaters

    International Nuclear Information System (INIS)

    The electrochemical degradation of chloride-mediated and chloride-free dye wastewaters was investigated on a boron-doped diamond (BDD) electrode in comparison with that on a dimensionally stable anode (DSA), and the applicability of BDD electrode to the degradation of these two kinds of wastewaters was explored. In chloride-free wastewater, the electrochemical degradation efficiency of dye on BDD electrode was much higher than that on DSA, with a chemical oxygen demand (COD) removal of 100% and 26% for BDD and DSA, respectively. In chloride-mediated dye wastewater, COD removal was faster than that in chloride-free wastewater on both BDD and DSA electrodes with COD removal efficiencies higher than 95%, whereas the rate of COD removal on DSA was faster than that on BDD electrode. The investigation indicates that DSA is more suitable than BDD electrode in degradation of originally chloride contained dye wastewaters for the sake of energy and time saving. However, for chloride-free dye wastewaters, with the aim of environmental protection, BDD electrode is more appropriate to realize complete mineralization. At the same time, the secondary pollution can be avoided

  20. Simultaneous square-wave voltammetric determination of aspartame and cyclamate using a boron-doped diamond electrode.

    Science.gov (United States)

    Medeiros, Roberta Antigo; de Carvalho, Adriana Evaristo; Rocha-Filho, Romeu C; Fatibello-Filho, Orlando

    2008-07-30

    A simple and highly selective electrochemical method was developed for the simultaneous determination of aspartame and cyclamate in dietary products at a boron-doped diamond (BDD) electrode. In square-wave voltammetric (SWV) measurements, the BDD electrode was able to separate the oxidation peak potentials of aspartame and cyclamate present in binary mixtures by about 400 mV. The detection limit for aspartame in the presence of 3.0x10(-4) mol L(-1) cyclamate was 4.7x10(-7) mol L(-1), and the detection limit for cyclamate in the presence of 1.0x10(-4) mol L(-1) aspartame was 4.2x10(-6) mol L(-1). When simultaneously changing the concentration of both aspartame and cyclamate in a 0.5 mol L(-1) sulfuric acid solution, the corresponding detection limits were 3.5x10(-7) and 4.5x10(-6) mol L(-1), respectively. The relative standard deviation (R.S.D.) obtained was 1.3% for the 1.0x10(-4) mol L(-1) aspartame solution (n=5) and 1.1% for the 3.0x10(-3) mol L(-1) cyclamate solution. The proposed method was successfully applied in the determination of aspartame in several dietary products with results similar to those obtained using an HPLC method at 95% confidence level.

  1. Electrochemical Sensing and Assessment of Parabens in Hydro- Alcoholic Solutions and Water Using a Boron-Doped Diamond Electrode

    Directory of Open Access Journals (Sweden)

    Vasile Ostafe

    2008-07-01

    Full Text Available In this paper, the electrochemical behaviour of several parabens preservatives, i.e. esters of p-hydroxybenzoic acid, methyl-, ethyl- and propyl-4-hydroxybenzoates as methyl-, ethyl- and propyl-parabens (MB, EB, and PB, has been investigated at a commercial boron-doped diamond electrode (BDDE, especially in the anodic potential range, in both hydro-alcoholic and aqueous media. The cyclic voltammetric and chronoamperometric measurements yielded calibration plots with very good linearity (R2 between 0.990 and 0.998 and high sensitivity, useful for detection and analytical applications. The determination of the characteristics of individual compounds, of an “overall paraben index”, the assessment of the stability and the saturation solubility in water, and the amperometric sensing and determination in double distilled, tap and river water matrix of the relatively slightly soluble investigated parabens have been carried out using electrochemical alternative. Estimated water solubility was correlated with the octanol-water partition coefficient. Several ideas regarding stability and persistence of the presumptive eco-toxic investigated preservatives in the environment or water systems have been adjacently discussed.

  2. Biofouling resistance of boron-doped diamond neural stimulation electrodes is superior to titanium nitride electrodes in vivo

    Science.gov (United States)

    Meijs, S.; Alcaide, M.; Sørensen, C.; McDonald, M.; Sørensen, S.; Rechendorff, K.; Gerhardt, A.; Nesladek, M.; Rijkhoff, N. J. M.; Pennisi, C. P.

    2016-10-01

    Objective. The goal of this study was to assess the electrochemical properties of boron-doped diamond (BDD) electrodes in relation to conventional titanium nitride (TiN) electrodes through in vitro and in vivo measurements. Approach. Electrochemical impedance spectroscopy, cyclic voltammetry and voltage transient (VT) measurements were performed in vitro after immersion in a 5% albumin solution and in vivo after subcutaneous implantation in rats for 6 weeks. Main results. In contrast to the TiN electrodes, the capacitance of the BDD electrodes was not significantly reduced in albumin solution. Furthermore, BDD electrodes displayed a decrease in the VTs and an increase in the pulsing capacitances immediately upon implantation, which remained stable throughout the whole implantation period, whereas the opposite was the case for the TiN electrodes. Significance. These results reveal that BDD electrodes possess a superior biofouling resistance, which provides significantly stable electrochemical properties both in protein solution as well as in vivo compared to TiN electrodes.

  3. Electrochemical degradation of the antihypertensive losartan in aqueous medium by electro-oxidation with boron-doped diamond electrode.

    Science.gov (United States)

    Salazar, Claudio; Contreras, Nicole; Mansilla, Héctor D; Yáñez, Jorge; Salazar, Ricardo

    2016-12-01

    In this work the electrochemical oxidation of losartan, an emerging pharmaceutical pollutant, was studied. Electrochemical oxidation was carried out in batch mode, in an open and undivided cell of 100cm(3) using a boron-doped diamond (BDD)/stainless steel system. With Cl(-) medium 56% of mineralization was registered, while with the trials containing SO4(2-) as supporting electrolyte a higher mineralization yield of 67% was reached, even obtaining a total removal of losartan potassium at 80mAcm(-2) and 180min of reaction time at pH 7.0. Higher losartan potassium concentrations enhanced the mineralization degree and the efficiency of the electrochemical oxidation process. During the mineralization up to 4 aromatic intermediates were identified by ultra high performance liquid chromatography tandem mass spectrometry (UHPLC-MS/MS). Moreover, short-linear carboxylic acids, like oxalic, succinic and oxamic were detected and quantified by ion-exclusion HPLC. Finally, the ability of the electrochemical oxidation process to mineralize dissolved commercial tablets containing losartan was achieved, obtaining TOC removal up to 71% under optimized conditions (10mAcm(-2), 0.05M Na2SO4, pH 7.0 and 25°C and 360min of electrolysis). PMID:27180209

  4. Photocarrier Radiometry Investigation of Light-Induced Degradation of Boron-Doped Czochralski-Grown Silicon Without Surface Passivation

    Science.gov (United States)

    Wang, Qian; Li, Bincheng

    2016-04-01

    Light-induced degradation (LID) effects of boron-doped Cz silicon wafers without surface passivation are investigated in details by photocarrier radiometry (PCR). The resistivity of all samples is in the range of 0.006 Ω {\\cdot } {cm} to 38 Ω {\\cdot } {cm}. It is found that light-induced changes in surface state occupation have a great effect on LID under illumination. With the increasing contribution of light-induced changes in surface state occupation, the generation rate of the defect decreases. The light-induced changes in surface state occupation and light-induced degradation dominate the temporal behaviors of the excess carrier density of high- and low-resistivity Si wafers, respectively. Moreover, the temporal behaviors of PCR signals of these samples under laser illumination with different powers, energy of photons, and multiple illuminations were also analyzed to understand the light-induced change of material properties. Based on the nonlinear dependence of PCR signal on the excitation power, a theoretical model taking into account both light-induced changes in surface state occupation and LID processes was proposed to explain those temporal behaviors.

  5. Determination of propylthiouracil in pharmaceuticals by differential pulse voltammetry using a cathodically pretreated boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Sartori, Elen Romao [Universidade Estadual de Londrina, PR (Brazil). Dept. de Quimica; Trench, Aline Barrios; Rocha-Filho, Romeu C.; Fatibello-Filho, Orlando, E-mail: bello@ufscar.br [Universidade Federal de Sao Carlos (UFSCAR), SP (Brazil). Dept. de Quimica

    2013-09-15

    A simple procedure is described for the determination of propylthiouracil (PTU) by differential pulse voltammetry (DPV) using a cathodically pretreated boron-doped diamond (BDD) electrode. Cyclic voltammetry studies indicate that the oxidation of PTU is irreversible at a peak potential of 1.42 V (vs. Ag/AgCl (3.0 mol L{sup -1} KCl)) in a Britton-Robinson (BR) buffer solution (pH 2.0). Under optimized conditions, the obtained analytical curve was linear (r = 0.9985) for the PTU concentration range of 1.0 to 29.1 {mu}mol L{sup -1} in a BR buffer solution (pH 2.0), with a detection limit of 0.90 {mu}mol L{sup -1}. The proposed method was successfully applied in the determination of PTU in pharmaceutical samples, with results in agreement at a 95% confidence level with those obtained using an official titration method. (author)

  6. Simultaneous determination of paracetamol and ibuprofen in pharmaceutical samples by differential pulse voltammetry using a boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Lima, Amanda B.; Guimaraes, Carlos F.R.C.; Verly, Rodrigo M.; Silva, Leonardo M. da [Universidade Federal dos Vales do Jequitinhonha e Mucuri (UFVJM), Diamantina, MG (Brazil). Departamento de Quimica; Torres, Livia M.F.C.; Carvalho Junior, Alvaro D.; Santos, Wallans T. P. dos, E-mail: wallanst@ufvjm.edu.br [Universidade Federal dos Vales do Jequitinhonha e Mucuri (UFVJM), Diamantina, MG (Brazil). Departamento de Farmacia

    2014-03-15

    This work presents a simple, fast and low-cost methodology for the simultaneous determination of paracetamol (PC) and ibuprofen (IB) in pharmaceutical formulations by differential pulse voltammetry using a boron-doped diamond (BDD) electrode. A well-defined oxidation peak was observed using the BDD electrode for each analyte (0.85 V for PC and 1.72 V for IB (vs. Ag/AgCl)) in 0.1 mol L{sup -1} H{sub 2}SO{sub 4} solution containing 10% (v/v) of ethanol. Calibration curves for the simultaneous determination of PC and IB showed a linear response for both drugs in a concentration range of 20 to 400 μmol L{sup -1} (r{sup 2} = 0.999), with a detection limit of 7.1 μmol L{sup -1} for PC and 3.8 μmol L{sup -1} for IB. The addition-recovery studies in samples were about 100% and the results were validated by chromatographic methods. (author)

  7. Voltammetric and electrochemical impedance spectroscopy characterization of a cathodic and anodic pre-treated boron doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, S. Carlos B. [Departamento de Quimica, Faculdade de Ciencias e Tecnologia, Universidade de Coimbra, 3004-535 Coimbra (Portugal); Oliveira-Brett, Ana Maria, E-mail: brett@ci.uc.p [Departamento de Quimica, Faculdade de Ciencias e Tecnologia, Universidade de Coimbra, 3004-535 Coimbra (Portugal)

    2010-06-01

    The effect of boron doped diamond (BDD) surface termination, immediately after cathodic and anodic electrochemical pre-treatments, on the electrochemical response of a BDD electrode in aqueous media and the influence of the different supporting electrolytes utilized in these pre-treatments on the final surface termination was investigated with [Fe(CN){sub 6}]{sup 4-/3-}, as redox probe, by cyclic and differential pulse voltammetry and electrochemical impedance spectroscopy. The cyclic voltammetry results indicate that the electrochemical behavior for the redox couple [Fe(CN){sub 6}]{sup 4-/3-} is very dependent on the state of the BDD surface, and a reversible response was observed after the cathodic electrochemical pre-treatment, whereas a quasi-reversible response occurred after anodic electrochemical pre-treatment. Differential pulse voltammetry in acetate buffer also showed that the potential window is very much influenced by the electrochemical pre-treatment of the BDD surface. Electroactivity of non-diamond carbon surface species (sp{sup 2} inclusions) incorporated into the diamond structure was observed after cathodic and anodic pre-treatments. Electrochemical impedance spectroscopy confirmed the cyclic voltammetry results and indicates that the BDD surface resistance and capacitance vary significantly with the electrolyte and with the electrochemical pre-treatment, caused by different surface terminations of the BDD electrode surface.

  8. Control of electron transfer kinetics at boron-doped diamond electrodes by specific surface modification

    OpenAIRE

    Duo, Ilaria; Comninellis, Christos

    2005-01-01

    Diamond films with different levels of doping have been the subject of applications and fundamental research in electrochemistry, opening up a new branch known as the electrochemistry of diamond. The electrochemical properties of diamond mostly depend on the operating conditions during the deposition of the film and on the treatment of the surface. The absence so far of a standard procedure in the production and treatment of diamond films has created a wide range of diamond quality and proper...

  9. Control of electron transfer kinetics at boron-doped diamond electrodes by specific surface modification

    OpenAIRE

    Duo, Ilaria

    2003-01-01

    Diamond films with different levels of doping have been the subject of applications and fundamental research in electrochemistry, opening up a new branch known as the electrochemistry of diamond. The electrochemical properties of diamond mostly depend on the operating conditions during the deposition of the film and on the treatment of the surface. The absence so far of a standard procedure in the production and treatment of diamond films has created a wide range of diamond quality and proper...

  10. A computational investigation of boron-doped chromium and chromium clusters by density functional theory

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    The geometries,stabilities and electronic properties of Crn and CrnB(n=2-9) clusters have been systematically investigated by density functional theory.The results suggest that the lowest energy structures for CrnB clusters can be obtained by substituting one Cr atom in Crn+1 clusters with B atom.The geometries of CrnB clusters are similar to that of Crn+1 clusters except for local structural distortion.The second-order difference and fragmentation energy show Cr4,Cr6,Cr8,Cr3B,Cr5B and Cr8B cluster are the most stable among these studied clusters.The impurity B increases the stabilities of chromium cluster.When B is doped on the Crn clusters,cluster geometry does dominate positive role in enhancing their stability.The doped B atom does not change the coupling way of the Cr site in Crn clusters,but breaks the symmetry and the Cr atoms are no longer equivalent.The doped B atom increases the total magnetic moments of Crn in most cases.

  11. A deep-submicron single gate CMOS technology using in-situ boron-doped polycrystalline silicon-germanium gates formed by rapid thermal chemical vapor deposition

    Science.gov (United States)

    Li, Vivian Zhi-Qi

    This thesis presents a comprehensive study of in-situ boron doped polycrystalline-Sisb{1-x}Gesb{x} films deposited in a rapid thermal chemical vapor deposition system and used as the gate electrode in the deep submicron bulk CMOS technology. This work includes an investigation of the nucleation behavior of poly-Sisb{1-x}Gesb{x} films on the oxide surface, development of a deposition process using Sisb2Hsb6,\\ GeHsb4 and Bsb2Hsb6 gases in addition to using common gas mixture of SiHsb4,\\ GeHsb4 and Bsb2Hsb6 in a RTCVD system, characterization of the deposited film structure and its properties, examination of the electrical properties, extraction of the workfunction as a function of the Ge content in the film, development of the NMOS, PMOS and CMOS processes for in-situ boron doped poly-Sisb{1-x}Gesb{x} gate technology, assessment of the impact of poly-Sisb{1-x}Gesb{x} gate on the device performance through computer simulations. The process integration issues such as boron penetration, poly-depletion and gate oxide reliability, and characterization of deep submicron CMOS devices are also studied. One critical concern with the use of poly-Sisb{1-x}Gesb{x} gate materials is its partially selective deposition process on the SiOsb2. In this work, we demonstrated non-selective deposition processes for poly-Sisb{1-x}Gesb{x} without conventional Si pre-deposition onto oxide. One approach is by using in-situ boron doping method and another is by using Sisb2Hsb6 as the Si source gas. Also, it was found that the density of the nucleation sites at the initial stage of deposition increases with the increase of the Bsb2Hsb6 gas flow rate. The resulting continuous poly-Sisb{1-x}Gesb{x} films were attributed to the preferential adsorption of boron atoms onto the oxide surface providing the necessary nucleation sites for the subsequent Sisb{1-x}Gesb{x} film growth. For undoped poly-Sisb{1-x}Gesb{x} films, continuous films can be formed on the oxide using Sisb2Hsb6 and GeHsb4 gases

  12. Surface Roughness and Critical Exponent Analyses of Boron-Doped Diamond Films Using Atomic Force Microscopy Imaging: Application of Autocorrelation and Power Spectral Density Functions

    Science.gov (United States)

    Gupta, S.; Vierkant, G. P.

    2014-09-01

    The evolution of the surface roughness of growing metal or semiconductor thin films provides much needed information about their growth kinetics and corresponding mechanism. While some systems show stages of nucleation, coalescence, and growth, others exhibit varying microstructures for different process conditions. In view of these classifications, we report herein detailed analyses based on atomic force microscopy (AFM) characterization to extract the surface roughness and growth kinetics exponents of relatively low boron-doped diamond (BDD) films by utilizing the analytical power spectral density (PSD) and autocorrelation function (ACF) as mathematical tools. The machining industry has applied PSD for a number of years for tool design and analysis of wear and machined surface quality. Herein, we present similar analyses at the mesoscale to study the surface morphology as well as quality of BDD films grown using the microwave plasma-assisted chemical vapor deposition technique. PSD spectra as a function of boron concentration (in gaseous phase) are compared with those for samples grown without boron. We find that relatively higher boron concentration yields higher amplitudes of the longer-wavelength power spectral lines, with amplitudes decreasing in an exponential or power-law fashion towards shorter wavelengths, determining the roughness exponent ( α ≈ 0.16 ± 0.03) and growth exponent ( β ≈ 0.54), albeit indirectly. A unique application of the ACF, which is widely used in signal processing, was also applied to one-dimensional or line analyses (i.e., along the x- and y-axes) of AFM images, revealing surface topology datasets with varying boron concentration. Here, the ACF was used to cancel random surface "noise" and identify any spatial periodicity via repetitive ACF peaks or spatially correlated noise. Periodicity at shorter spatial wavelengths was observed for no doping and low doping levels, while smaller correlations were observed for relatively

  13. Organic Solar Cells with Boron- or Nitrogen-Doped Carbon Nanotubes in the P3HT : PCBM Photoactive Layer

    Directory of Open Access Journals (Sweden)

    Godfrey Keru

    2016-01-01

    Full Text Available Either boron- or nitrogen-doped carbon nanotubes (B- or N-CNTs were incorporated in bulk heterojunction organic solar cells photoactive layer composed of poly(3-hexylthiophene (P3HT : (6,6-phenyl-C61-butyric acid methyl ester (PCBM. The physical and chemical properties were investigated using different spectroscopic techniques. The cell performance was followed from their current-voltage (J-V characteristics. Recombination dynamics of the photo-generated free charge carriers were investigated using micro- to milliseconds transient absorption spectroscopy (TAS. Transmission electron microscopy (TEM images revealed the presence of cone structures and bamboo compartments in B-CNTs and N-CNTs, respectively. X-ray photoelectron spectroscopy (XPS revealed very little boron was substituted in the carbon network and presence of pyrrolic, pyridinic, and quaternary species of nitrogen in N-CNTs. J-V characteristics were found to be similar for the devices with B- and N-CNTs even though boron- and nitrogen-doped CNTs are known to have different properties, that is, p-type and n-type, respectively. TAS results showed that all devices had long lived free charge carriers but the devices with B- or N-CNTs had low power conservation efficiency and voltage.

  14. High quality cubic boron nitride films - A starting point for doping experiments

    Energy Technology Data Exchange (ETDEWEB)

    Yin, Hong; Pongrac, Ivan; Wang, Xuyang; Boyen, Hans-Gerd; Ziemann, Paul [Institute of Solid State Physics, University of Ulm, D-89081 Ulm (Germany); Dohuard, Bastien; Houssiau, Laurent [LISE, University of Namur, B-5000 Namur (Belgium); Bittencourt, Carla [Materia Nova, B- 7000 Mons (Belgium)

    2007-07-01

    After the successful demonstration that c-BN films can be epitaxially grown at 900 C on top of (001)-oriented diamond substrates, such high quality samples serve as starting point for their doping with Si atoms. For this purpose, a small stripe of a Si-wafer is co-sputtered during the c-BN deposition and the resulting concentration of Si as well as of unintentionally incorporated contaminants are determined by XPS, AES for near surface concentrations and ToF-SIMS for depth profiling. These results will be related to first temperature-dependent resistance measurements.

  15. Electrochemical characterisation and oxygen evolution at a heavily boron doped diamond electrode

    International Nuclear Information System (INIS)

    Characterisation of a commercial heavily doped BDD electrode demonstrated it contains a small sp2 content, which on anodic potential scanning, is oxidised to CO/CO2. This surface modification alters the electrode activity, increasing the overpotential for the hydrogen and oxygen evolution reactions (HER and OER). Ex situ and in situ investigations indicate film morphology is mainly composed of 'chain of hills', presenting relatively high differential capacitance values and morphology factor, which is attributed to the effect of surface states and high surface roughness of the BDD film. The voltammetric behaviour depends on the applied potential; the heavily doped BDD electrode behaving as a metallic electrode at more anodic potentials. Polarisation curves (potentiostatic (1 mV s-1) or galvanostatic (point-by-point)), recorded at different temperatures and H2SO4 concentrations, lead to the same conclusions. The high Tafel coefficients and low apparent electronic transfer coefficient (αA) are independent of overpotential and temperature but show a dependence on H2SO4 concentration. The linear relationship observed between the apparent electrochemical enthalpy of activation (ΔHhashmarkη) and overpotential supports αA is constant. An OER mechanism was proposed taking into account the absence of adsorption sites at the BDD surface. The OER is inhibited, explaining the high overpotentials and elevated ΔHhashmar'Kη values

  16. Potentiometric application of boron- and phosphorus-doped glassy carbon electrodes

    Directory of Open Access Journals (Sweden)

    ZORAN V. LAUSEVIC

    2001-03-01

    Full Text Available Acomparative study was carried out of the potentiometric application of boronand phosphorus-doped and undoped glassy carbon samples prepared at the same heat treatment temperature (HTT 1000°C. The electrochemical activities of the obtained electrode materials were investigated on the example of argentometric titrations. It was found that the electrochemical behaviour of the doped glassy carbon samples are very similar to a Sigri (undoped glassy carbon sample (HTT 2400°C. The experiments showed that the potentiometric response depends on the polarization mode, the nature of the sample, the pretreatment of the electrode surface, and the nature of the supporting electrolyte. The amounts of iodide, bromide, and of chloridewere determined to be 1.27 mg, 0.80 mg and 0.54 mg, respectively, with a maximum relative standard deviation of less than 1.1%. The obtained results are in good agreement with the results of comparative potentiometric titrations using a silver indicator electrode. The titrationmethod was applied to the indirect determination of pyridoxine hydrochloride, i.e., vitamin B6.

  17. Tensile properties of a boron/nitrogen-doped carbon nanotube–graphene hybrid structure

    Directory of Open Access Journals (Sweden)

    Kang Xia

    2014-03-01

    Full Text Available Doping is an effective approach that allows for the intrinsic modification of the electrical and chemical properties of nanomaterials. Recently, a graphene and carbon nanotube hybrid structure (GNHS has been reported, which extends the excellent properties of carbon-based materials to three dimensions. In this paper, we carried out a first-time investigation on the tensile properties of the hybrid structures with different dopants. It is found that with the presence of dopants, the hybrid structures usually exhibit lower yield strength, Young’s modulus, and earlier yielding compared to that of a pristine hybrid structure. For dopant concentrations below 2.5% no significant reduction of Young’s modulus or yield strength could be observed. For all considered samples, the failure is found to initiate at the region where the nanotubes and graphene sheets are connected. After failure, monatomic chains are normally observed around the failure region. Dangling graphene layers without the separation of a residual CNT wall are found to adhere to each other after failure with a distance of about 3.4 Å. This study provides a fundamental understanding of the tensile properties of the doped graphene–nanotube hybrid structures, which will benefit the design and also the applications of graphene-based hybrid materials.

  18. Electrochemical oxidation of amoxicillin in its pharmaceutical formulation at boron doped diamond (BDD electrode

    Directory of Open Access Journals (Sweden)

    Corneil Quand-Meme Gnamba

    2015-08-01

    Full Text Available In this work, voltammetric andelectrolysis experiments have been carried out on a conductive boron dopeddiamond (BDD electrode in solution containing amoxicillin in itspharmaceutical formulation. The physical characterization of the BDD surface byscanning electron microscopy (SEM reveals a polycrystalline structure withgrain sizes ranging between 0.3 and 0.6 µm. With Raman spectroscopy, BDDsurface is composed of diamons (Csp3 type carbon (Csp3and graphitic type carbon (Csp2. The electrochemical characterization of the BDD electrode in sulfuric acid electrolyte showed a wide potential window worthing 2.74 V. The oxidation of Amoxicillin showed an irreversible anodic wave on the voltammogram in the domain of water stability indicating a direct oxidation of amoxicillin at BDD surface. The treatment of Amoxicillin in the synthetic wastewaters under various constant current densities 20, 50, 100, 135 mA cm-2 on BDD showed that Amoxicillin is highly reducedunder 100 mA cm-2 reaching 92% of the Chemical Oxygen Demand (CODremoval after 5 h of electrolysis. Investigation performed in perchloric acidas supporting electrolyte led to 87% of COD removal after 5 h of electrolysis.Mineralization of amoxicillin occurs on BDD and the chemical oxygen demandremoval was higher in sulfuric acid than in perchloric acid owing to theinvolvement of the in-situ formed persulfate and perchlorate  to the degradation process mainly in the bulkof the solution. The instantaneous current efficiency (ICE presents anexponential decay indicating that the process was limited by diffusion. Thespecific energy consumed after 5h of the amoxicillin electrolysis was 0.096 kWh COD-1and 0.035 kWh COD-1 in sulfuric acid and in perchloric acidrespectively.

  19. Removal of organic contaminants from secondary effluent by anodic oxidation with a boron-doped diamond anode as tertiary treatment

    Energy Technology Data Exchange (ETDEWEB)

    Garcia-Segura, Sergi, E-mail: sergigarcia@ub.edu [Advanced Water Management Centre, The University of Queensland, Level 4, Gehrmann Bld. (60), St Lucia, QLD 072 (Australia); Laboratori d’Electroquímica dels Materials i del Medi Ambient, Departament de Química Física, Facultat de Química, Universitat de Barcelona, Martí i Franquès 1-11, 08028 Barcelona (Spain); Keller, Jürg [Advanced Water Management Centre, The University of Queensland, Level 4, Gehrmann Bld. (60), St Lucia, QLD 072 (Australia); Brillas, Enric [Laboratori d’Electroquímica dels Materials i del Medi Ambient, Departament de Química Física, Facultat de Química, Universitat de Barcelona, Martí i Franquès 1-11, 08028 Barcelona (Spain); Radjenovic, Jelena, E-mail: j.radjenovic@awmc.uq.edu.au [Advanced Water Management Centre, The University of Queensland, Level 4, Gehrmann Bld. (60), St Lucia, QLD 072 (Australia)

    2015-02-11

    Graphical abstract: - Highlights: • Mineralization of secondary effluent by anodic oxidation with BDD anode. • Complete removal of 29 pharmaceuticals and pesticides at trace level concentrations. • Organochlorine and organobromine byproducts were formed at low μM concentrations. • Chlorine species evolution assessed to evaluate the anodic oxidation applicability. - Abstract: Electrochemical advanced oxidation processes (EAOPs) have been widely investigated as promising technologies to remove trace organic contaminants from water, but have rarely been used for the treatment of real waste streams. Anodic oxidation with a boron-doped diamond (BDD) anode was applied for the treatment of secondary effluent from a municipal sewage treatment plant containing 29 target pharmaceuticals and pesticides. The effectiveness of the treatment was assessed from the contaminants decay, dissolved organic carbon and chemical oxygen demand removal. The effect of applied current and pH was evaluated. Almost complete mineralization of effluent organic matter and trace contaminants can be obtained by this EAOP primarily due to the action of hydroxyl radicals formed at the BDD surface. The oxidation of Cl{sup −} ions present in the wastewater at the BDD anode gave rise to active chlorine species (Cl{sub 2}/HClO/ClO{sup −}), which are competitive oxidizing agents yielding chloramines and organohalogen byproducts, quantified as adsorbable organic halogen. However, further anodic oxidation of HClO/ClO{sup −} species led to the production of ClO{sub 3}{sup −} and ClO{sub 4}{sup −} ions. The formation of these species hampers the application as a single-stage tertiary treatment, but posterior cathodic reduction of chlorate and perchlorate species may reduce the risks associated to their presence in the environment.

  20. Electrochemical treatment of reverse osmosis concentrate on boron-doped electrodes in undivided and divided cell configurations

    Energy Technology Data Exchange (ETDEWEB)

    Bagastyo, Arseto Y. [Advanced Water Management Centre, The University of Queensland, St Lucia, QLD 4072 (Australia); Department of Environmental Engineering, Institut Teknologi Sepuluh Nopember, Surabaya 60111 (Indonesia); Batstone, Damien J. [Advanced Water Management Centre, The University of Queensland, St Lucia, QLD 4072 (Australia); Kristiana, Ina [Curtin Water Quality Research Centre, Resources and Chemistry Precinct, Department of Chemistry, Curtin University, Bentley, Perth, WA 6102 (Australia); Escher, Beate I. [National Research Centre for Environmental Toxicology (Entox), The University of Queensland, Brisbane, QLD 4108 (Australia); Joll, Cynthia [Curtin Water Quality Research Centre, Resources and Chemistry Precinct, Department of Chemistry, Curtin University, Bentley, Perth, WA 6102 (Australia); Radjenovic, Jelena, E-mail: j.radjenovic@uq.edu.au [Advanced Water Management Centre, The University of Queensland, St Lucia, QLD 4072 (Australia)

    2014-08-30

    Highlights: • 100% of COD and ∼70% of DOC was removed in both cell configurations. • ∼21.7 mg L{sup −1} of AOCl and ∼2.3 mg L{sup −1} of AOBr was formed regardless of the membrane use. • The TEQ was far lower than expected given the high AOCl concentrations. • The undivided cell consumed lower energy compared to the divided cell. - Abstract: An undivided electrolytic cell may offer lower electrochlorination through reduction of chlorine/hypochlorite at the cathode. This study investigated the performance of electrooxidation of reverse osmosis concentrate using boron-doped diamond electrodes in membrane-divided and undivided cells. In both cell configurations, similar extents of chemical oxygen demand and dissolved organic carbon removal were obtained. Continuous formation of chlorinated organic compounds was observed regardless of the membrane presence. However, halogenation of the organic matter did not result in a corresponding increase in toxicity (Vibrio fischeri bioassay performed on extracted samples), with toxicity decreasing slightly until 10 Ah L{sup −1}, and generally remaining near the initial baseline-toxicity equivalent concentration (TEQ) of the raw concentrate (i.e., ∼2 mg L{sup −1}). The exception was a high range toxicity measure in the undivided cell (i.e., TEQ = 11 mg L{sup −1} at 2.4 Ah L{sup −1}), which rapidly decreased to 4 mg L{sup −1}. The discrepancy between the halogenated organic matter and toxicity patterns may be a consequence of volatile and/or polar halogenated by-products formed in oxidation by OH· electrogenerated at the anode. The undivided cell exhibited lower energy compared to the divided cell, 0.25 kWh gCOD{sup −1} and 0.34 kWh gCOD{sup −1}, respectively, yet it did not demonstrate any improvement regarding by-products formation.

  1. Removal of organic contaminants from secondary effluent by anodic oxidation with a boron-doped diamond anode as tertiary treatment

    International Nuclear Information System (INIS)

    Graphical abstract: - Highlights: • Mineralization of secondary effluent by anodic oxidation with BDD anode. • Complete removal of 29 pharmaceuticals and pesticides at trace level concentrations. • Organochlorine and organobromine byproducts were formed at low μM concentrations. • Chlorine species evolution assessed to evaluate the anodic oxidation applicability. - Abstract: Electrochemical advanced oxidation processes (EAOPs) have been widely investigated as promising technologies to remove trace organic contaminants from water, but have rarely been used for the treatment of real waste streams. Anodic oxidation with a boron-doped diamond (BDD) anode was applied for the treatment of secondary effluent from a municipal sewage treatment plant containing 29 target pharmaceuticals and pesticides. The effectiveness of the treatment was assessed from the contaminants decay, dissolved organic carbon and chemical oxygen demand removal. The effect of applied current and pH was evaluated. Almost complete mineralization of effluent organic matter and trace contaminants can be obtained by this EAOP primarily due to the action of hydroxyl radicals formed at the BDD surface. The oxidation of Cl− ions present in the wastewater at the BDD anode gave rise to active chlorine species (Cl2/HClO/ClO−), which are competitive oxidizing agents yielding chloramines and organohalogen byproducts, quantified as adsorbable organic halogen. However, further anodic oxidation of HClO/ClO− species led to the production of ClO3− and ClO4− ions. The formation of these species hampers the application as a single-stage tertiary treatment, but posterior cathodic reduction of chlorate and perchlorate species may reduce the risks associated to their presence in the environment

  2. Electrochemical degradation of 17{beta}-estradiol (E2) at boron-doped diamond (Si/BDD) thin film electrode

    Energy Technology Data Exchange (ETDEWEB)

    Murugananthan, M. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)]. E-mail: muruga.chem@gmail.com; Yoshihara, S. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)]. E-mail: sachioy@cc.utsunomiya-u.ac.jp; Rakuma, T. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan); Uehara, N. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan); Shirakashi, T. [Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585 (Japan)

    2007-02-15

    Electrochemical degradation of aqueous solutions containing 17{beta}-estradiol (E2), concentrations range of 250-750 {mu}g dm{sup -3}, has been extensively studied using boron-doped diamond (BDD) anode with a working solution volume of 250 ml under galvanostatic control. Cyclic voltammetric experiments were performed to examine the redox response of E2 as a function of cycle number. The effect of operating variables such as initial concentration of E2, applied current density, supporting medium (Na{sub 2}SO{sub 4}, NaNO{sub 3}, and NaCl) and initial pH of the electrolyte (pH 2-10) were systematically examined and discussed. Electrolysis at high anodic potential causes complex oxidation of E2 that leads to form the final sole product as CO{sub 2}. A pseudo first-order kinetics for E2 decay was found against varying applied current density. Also, kinetic analysis suggests that electrooxidation reaction of E2 undergo the control of applied current density. It was observed that electrolyte pH and supporting medium have a vital role on E2 degradation. From a comparison study with other anode materials such as platinum (Pt) and glassy carbon (GC), the superiority of the BDD anode was proved. Total organic carbon results have shown that almost complete mineralization could be accomplished at higher applied current density with specific electrical charge 22.5 x 10{sup -2} A h dm{sup -3}. Mineralization current efficiency was comparatively lower with increasing applied current density.

  3. Determination of parabens in shampoo using high performance liquid chromatography with amperometric detection on a boron-doped diamond electrode.

    Science.gov (United States)

    Martins, Isarita; Carreira, Franciely Cristiani; Canaes, Larissa S; de Souza Campos Junior, Francisco Alberto; da Silva Cruz, Letícia Maria; Rath, Susanne

    2011-07-15

    Methylparaben (MePa), ethylparaben (EtPa) and propylparaben (PrPa) have been widely used, among others, as chemical preservatives in cosmetics, drugs and foods. As these compounds are linked with allergies, dermatitis and estrogenic properties, it is necessary to control the concentration of these substances in different matrices. The aim of this paper are: to evaluate the electrochemical behavior of parabens on the boron-doped diamond (BDD) electrode and the development of a chromatographic method, with electrochemical detection (HPLC-ED), for determination of parabens in shampoo. A BDD (8000 ppm) electrode was adapted in a thin layer mode analytical cell consisting of a stainless steel and a platinum wire as reference and auxiliary electrodes, respectively. Chromatographic separations were obtained with a reversed phase C8 analytical column and a mobile phase of 0.025 molL(-1) disodium phosphate, pH 7.0, and acetonitrile (40:60, v/v), delivered at a flow rate of 1.0 mL min(-1). Sample preparation was performed by solid phase extraction using C18 cartridges and acetonitrile for elution. Benzylparaben was employed as internal standard. The HPLC-ED method developed, using the BDD electrode, was validated for the determination of parabens in shampoos and presented adequate linearity (>0.999), in the range of 0.0125-0.500% (w/w), detectability 0.01% (w/w), precision (RSD of 2.3-9.8%) and accuracy (93.1-104.4%) and could be applied for routine quality control of shampoos containing MePa, EtPa and PrPa.

  4. SINTERING MECHANISM OF PURE AND CARBON_DOPED BORON CARBIDE%纯B4C和掺碳B4C的烧结机制

    Institute of Scientific and Technical Information of China (English)

    尹邦跃; 王零森; 方寅初

    2001-01-01

    Sintering densificaton process of pure and carbon_doped boron carbide powders with 0.42 μm median particle size were studied. Their sintering kinetic equations were obtained according to the influence of sintering temperature and holding time on linear shrinkage rate. The sintering mechanisms were investigated by comparing the characteristic exponent n. It is deduced that the main sintering mechanisms shill be volume diffusion and grain boundary diffusion for pure boron carbide and grain boundary diffusion for carbon_doped boron carbide showing activated sintering. The relative density of the carbon_doped B4C sintered at 2 160 ℃ for 45 min is more than 90%. Apart from those dissolved in the sintered boron carbide, the rest of the added carbon is in the form of free carbon, no new phase formed. Carbon_doping also result in a great decrease of B4C grain size.%研究了中位粒径为0.42 μm的纯B4C和掺碳B4C粉末的烧结致密化过程. 根据烧结温度和保温时间对线收缩率的影响,得出了它们的烧结动力学方程;由特征指数n值对比研究了它们的烧结致密化机制. 纯B4C的烧结致密化机制为体扩散和晶界扩散,而掺碳B4C的烧结机制主要为晶界扩散,因此,掺碳对B4C起到了活化烧结的作用. 在2 160 ℃烧结45 min,掺碳B4C烧结后相对密度大于90%. 掺入的碳除了固溶于B4C晶格中之外,其它均以游离石墨形式存在,不形成新相. 掺碳还导致B4C晶粒尺寸大大减小.

  5. Reactivity of boron- and nitrogen-doped carbon nanotubes functionalized by (Pt, Eu) atoms toward O2 and CO: A density functional study

    Science.gov (United States)

    Abdel Aal, S.

    2016-01-01

    The adsorption behavior and electronic properties of CO and O2 molecules at the supported Pt and Eu atoms on (5,5) armchair SWCNT have been systematically investigated within density functional theory (DFT). Fundamental aspects such as adsorption energy, natural bond orbital (NBO), charge transfer, frontier orbitals and the projected density of states (PDOS) are elucidated to analyze the adsorption properties of CO and O2 molecules. The results reveal that B- and N-doping CNTs can enhance the binding strength and catalytic activity of Pt (Eu) anchored on the doped-CNT, where boron-doping is more effective. The electronic structures of supported metal are strongly influenced by the presence of gases. After adsorption of CO and O2, the changes in binding energy, charge transfer and conductance may lead to the different response in the metal-doped CNT-based sensors. It is expected that these results could provide helpful information for the design and fabrication of the CO and O2 sensing devices. The high catalytic activity of Pt supported at doped-CNT toward the interaction with CO and O2 may be attributed to the electronic resonance particularly among Pt-5d, CO-2π* and O2-2π* antibonding orbitals. In contrast to the supported Eu at doped-CNT, the Eu atom becomes more positively charged, which leads to weaken the CO adsorption and promote the O2 adsorption, consequently enhancing the activity for CO oxidation and alleviating the CO poisoning of the europium catalysts. A notable orbital hybridization and electrostatic interaction between these two species in adsorption process being an evidence of strong interaction. The electronic structure of O2 adsorbed on Eu-doped CNT resembles that of O2-, therefore the transferred charge weakens the O-O bonds and facilitates the dissociation process, which is the precondition for the oxygen reduction reaction (ORR).

  6. Humid environment stability of low pressure chemical vapor deposited boron doped zinc oxide used as transparent electrodes in thin film silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Steinhauser, Jerome, E-mail: jerome.steinhauser@oerlikon.com [Institute of Microtechnology (IMT), University of Neuchatel, CH-2000 Neuchatel (Switzerland); Meyer, Stefan; Schwab, Marlene; Fay, Sylvie; Ballif, Christophe [Institute of Microtechnology (IMT), University of Neuchatel, CH-2000 Neuchatel (Switzerland); Kroll, U.; Borrello, D. [Oerlikon Solar-Lab, 2000 Neuchatel (Switzerland)

    2011-10-31

    The stability in humid environment of low pressure chemical vapor deposited boron doped zinc oxide (LPCVD ZnO:B) used as transparent conductive oxide in thin film silicon solar cells is investigated. Damp heat treatment (exposure to humid and hot atmosphere) induces a degradation of the electrical properties of unprotected LPCVD ZnO:B layers. By combining analyses of the electrical and optical properties of the films, we are able to attribute this behavior to an increase of electron grain boundary scattering. This is in contrast to the intragrain scattering mechanisms, which are not affected by damp heat exposure. The ZnO stability is enhanced for heavily doped films due to easier tunneling through potential barrier at grain boundaries.

  7. In situ fabrication of three-dimensional nitrogen and boron co-doped porous carbon nanofibers for high performance lithium-ion batteries

    Science.gov (United States)

    Zhang, Lijun; Xia, Guanglin; Guo, Zaiping; Sun, Dalin; Li, Xingguo; Yu, Xuebin

    2016-08-01

    This paper reports the fabrication of three-dimensional porous carbon nanofibers network with high doping level of nitrogen (N, 5.17 at.%) and boron (B, 6.87 at.%) through a general electrospinning strategy followed by a calcination process. The employed ammonia borane (NH3BH3, denote as AB) not only functions as a porogen reagent to generate porous structures but also as the heteroatoms source to induce N and B co-doping. Such highly unique nanoarchitectures offer remarkably improved Li storage performance including high reversible capacity (∼910 mAh g-1 at a current density of 100 mA g-1) with good cycling and rate performances.

  8. Effects of heat treatment conditions on the microstructure and impact properties of EUROFER 97 ODS steel

    International Nuclear Information System (INIS)

    Probably the most important range of materials to consider for the blanket material in the tokamak design for fusion reactors such as ITER and DEMO is the high alloy Fe9Cr oxide dispersion strengthened (ODS) ferritic steels. These steels possess exceptional thermal conductivity and low thermal expansion while being strongly resistant to void swelling. Their main drawback is the high ductile-to-brittle transition temperature (DBTT), particularly in the ODS versions of the material. This paper describes attempts that are being made to reduce this DBTT in as yet unirradiated materials by a novel heat treatment procedure. The principle behind this approach is that low DBTT in the unirradiated materials will lead to relatively low DBTT even in He-containing material that has been irradiated with fusion blanket-type irradiations. New batches of high alloy Fe9Cr ODS (EUROFER) ferritic steel have been produced by a powder metallurgical route, and relatively homogeneous material has been produced by a hot isostatic pressing procedure. Mini-Charpy test specimens were made from materials that had been subjected to a matrix of heat treatments designed to show up variations in solution treatment (ST) temperature, cooling rate from the ST temperature and tempering treatment. The initial DBTT was in the range 150-200 °C. Extremely interesting results have been obtained. DBTT downward shifts of up to 200 °C have been observed by using a high 1300 °C ST temperature and a low cooling rate. The paper goes on to describe the microstructure of this material, and discusses the possible microstructural factors needed to produce these very high DBTT downward shifts. Low dissolved carbon and higher proportions of low-angle grain boundaries seem to provide the key to the understanding of the alloy behaviour.

  9. Undoped and boron doped diamond nanoparticles as platinum and platinum-ruthenium catalyst support for direct methanol fuel cell application

    Science.gov (United States)

    La Torre Riveros, Lyda

    Nanoparticular diamond is a promising material that can be used as a robust and chemically stable catalytic support. It has been studied and characterized physically and electrochemically, in its powder and thin film forms. This thesis work intends to demonstrate that undoped diamond nanoparticles (DNPs) and boron-doped diamond nanoparticles (BDDNPs) can be used as an electrode and a catalytic support material for platinum and ruthenium catalysts. The electrochemical properties of diamond nanoparticle electrodes, fabricated using the ink paste method, were investigated. As an initial step, we carried out chemical purification of commercially available undoped DNPs by refluxing in aqueous HNO3 as well as of BDDNPs which were doped through a collaborative work with the University of Missouri. The purified material was characterized by spectroscopic and surface science techniques. The reversibility of reactions such as ferricyanide/ferrocyanide (Fe(CN) 63-/Fe(CN)64-) and hexaamineruthenium (III) chloride complexes as redox probes were evaluated by cyclic voltammetry at the undoped DNPs and BDDNPs surface. These redox probes showed limited peak currents and presented linear relationships between current (i) and the square root of the potential scan rate (v1/2). However, compared to conventional electrodes, the peak currents were smaller. BDDNPs show an improvement in charge transfer currents when compared to undoped DNPs. Platinum and ruthenium nanoparticles were chemically deposited on undoped DNPs and BDDNPs through the use of the excess of a mild reducing agent such NaBH4. In order to improve the nanoparticle dispersion sodium dodecyl benzene sulfonate (SDBS), a surfactant agent, was used. Percentages of platinum and ruthenium metals were varied as well as the stoichiometric amount of the reducing agent to determine adequate parameters for optimum performance in methanol oxidation. Both before and after the reducing process the samples were characterized by scanning

  10. Effects of bimetallic doping on small cyclic and tubular boron clusters: B7M2 and B14M2 structures with M = Fe, Co.

    Science.gov (United States)

    Pham, Hung Tan; Nguyen, Minh Tho

    2015-07-14

    Using density functional theory with the TPSSh functional and the 6-311+G(d) basis set, we extensively searched for the global minima of two metallic atoms doped boron clusters B6M2, B7M2, B12M2 and B14M2 with transition metal element M being Co and Fe. Structural identifications reveal that B7Co2, B7Fe2 and B7CoFe clusters have global minima in a B-cyclic motif, in which a perfectly planar B7 is coordinated with two metallic atoms placed along the C7 axis. The B6 cluster is too small to form a cycle with the presence of two metals. Similarly, the B12 cluster is not large enough to stabilize the metallic dimer within a double ring 2 × B6 tube. The doped B14M2 clusters including B14Co2, B14Fe2 and B14CoFe have a double ring 2 × B7 tubular shape in which one metal atom is encapsulated by the B14 tube and the other is located at an exposed position. Dissociation energies demonstrate that while bimetallic cyclic cluster B7M2 prefers a fragmentation channel that generates the B7 global minimum plus metallic dimer, the tubular structure B14M2 tends to dissociate giving a bimetallic cyclic structure B7M2 and a B@B6 cluster. The enhanced stability of the bimetallic doped boron clusters considered can be understood from the stabilizing interactions between the anti-bonding MOs of metal-metal dimers and the levels of a disk aromatic configuration (for bimetallic cyclic structures), or the eigenstates of the B14 tubular form (in case of bimetallic tubular structure).

  11. 硼对金属间化合物Ni3Fe氢气诱发环境氢脆的影响%Influence of boron-doping on the H2-induced environmental embrittlement of Ni3Fe intermetallics

    Institute of Scientific and Technical Information of China (English)

    石丹丹; 陈业新; 万晓景; LIU Chain Tsuan

    2007-01-01

    In this paper the tensile properties of both ordered and disordered Ni-24Fe and Ni-24Fe-0.03%B (wt%) alloys in gaseous hydrogen was investigated. The result shows that the ductility of the disordered Ni3Fe is significantly larger than that of ordered material in gaseous hydrogen. However, the ductility of ordered Ni3Fe doped with 0.03%B is nearly the same as that of disordered one indicating the obvious suppressing effect of boron on the H2-induced embrittlement. Based on the segregation behavior of boron in Ni3Al, it is proposed that the suppressing effect of boron in Ni3Fe on the H2-induced embrittlement is attributed to the segregation of boron on grain boundaries, thereby reducing the hydrogen diffusivity along the grain boundaries.

  12. Direct assessment of the mechanical modulus of graphene co-doped with low concentrations of boron-nitrogen by a non-contact approach

    Science.gov (United States)

    Pan, Shun-Hsien; Medina, Henry; Wang, Sheng-Bo; Chou, Li-Jen; Wang, Zhiming M.; Chen, Kuei-Hsien; Chen, Li-Chyong; Chueh, Yu-Lun

    2014-07-01

    Boron and nitrogen co-doping has been shown to be an effective way to induce a band gap in graphene for electrical applications but only a few theoretical studies have been done to understand the elastic and mechanical properties of the modified graphene. Until now, no experimental assessment of the mechanical modulus of boron-nitrogen-doped graphene (BNG) has been reported in the literature. Here, we demonstrate a novel non-contact approach to determine the in-plane stiffness of BNG at low BN concentrations. The in-plane stiffness of BNG with 2 at% BN concentration was estimated to be about 309 N m-1, which is lower than that of pristine graphene, in good agreement with some theoretical studies. Moreover, we correlated the conductivity of BNG with induced strain and found the BNG to be more sensitive than pristine graphene in response to externally applied strain. This result indicates that BNG is a more suitable material than graphene for strain sensor applications.Boron and nitrogen co-doping has been shown to be an effective way to induce a band gap in graphene for electrical applications but only a few theoretical studies have been done to understand the elastic and mechanical properties of the modified graphene. Until now, no experimental assessment of the mechanical modulus of boron-nitrogen-doped graphene (BNG) has been reported in the literature. Here, we demonstrate a novel non-contact approach to determine the in-plane stiffness of BNG at low BN concentrations. The in-plane stiffness of BNG with 2 at% BN concentration was estimated to be about 309 N m-1, which is lower than that of pristine graphene, in good agreement with some theoretical studies. Moreover, we correlated the conductivity of BNG with induced strain and found the BNG to be more sensitive than pristine graphene in response to externally applied strain. This result indicates that BNG is a more suitable material than graphene for strain sensor applications. Electronic supplementary

  13. Electrochemical oxidation of vinasses using a boron doped diamond electrode; Degradacao eletroquimica da vinhaca usando eletrodo de diamante dopado com boro

    Energy Technology Data Exchange (ETDEWEB)

    Batista, Eveline Cristine; Oliveira, Robson Tadeu Soares de, E-mail: robson@icbn.uftm.edu.br [Universidade Federal do Triangulo Mineiro, Uberaba, MG (Brazil). Inst. de Ciencias Biologicas e Naturais; Ferreira, Rafael de Queiroz [Universidade Federal do Espirito Santo (UFES), Vitoria, ES (Brazil). Dept. de Quimica; Miwa, Douglas [Universidade de Sao Paulo (USP), Sao Carlos, SP (Brazil). Inst. de Quimica; Santos, Mauro Coelho dos [Universidade Federal do ABC, Santo Andre, SP (Brazil)

    2011-07-01

    The degradation of vinasses in aqueous solution from ethanol industry has been investigated by electrochemical oxidation using a boron doped diamond electrode (BDD). Samples of vinasses were electrolysed in medium of (0.1 mol L-1) Na{sub 2}SO{sub 4} solutions at controlled potentials of +2.4, +3.0 and +4.0 V (vs. Ag/AgCl) and exhibited considerable reduction of total organic carbon. The cyclic voltammetry studies indicate that the vinasses are oxidized irreversibly over the BDD at 2.0 V (vs. Ag/AgCl) in diffusion controlled process. From the experimental results it is clear that the BDD electrode can be a valuable tool to the electrochemical degradation of vinasses in practical applications. (author)

  14. Pulsed Amperometry for Anti-fouling of Boron-doped Diamond in Electroanalysis of β-Agonists: Application to Flow Injection for Pharmaceutical Analysis

    Directory of Open Access Journals (Sweden)

    Duangjai Nacapricha

    2006-01-01

    Full Text Available This work presents the construction and application of boron-doped diamond(BDD thin film electrode as sensor for the determination of three β-agonists, viz.salbutamol, terbutaline and clenbuterol. Although well-known as a chemically inertmaterial, BDD film however shows fouling in detection of these compounds using fixedpotentialmode amperometry. A suitable waveform for pulsed amperometric detection(PAD was developed and used to determine the agonist compounds. It was seen that thedeveloped PAD significantly refreshed the BDD surface for long-term detection in flowinjection analysis. Linear working ranges were 0.5-100 μM, 1.0-100 μM and 0.5-50 μM forsalbutamol, terbutaline and clenbuterol, respectively. The developed PAD-BDD system wasapplied to successfully determine salbutamol and terbutaline in commercial pharmaceuticalproducts. The methods were validated with a capillary electrophoresis method.

  15. Electroanalysis of sulfonamides by flow injection system/high-performance liquid chromatography coupled with amperometric detection using boron-doped diamond electrode.

    Science.gov (United States)

    Preechaworapun, Anchana; Chuanuwatanakul, Suchada; Einaga, Yasuaki; Grudpan, Kate; Motomizu, Shoji; Chailapakul, Orawon

    2006-02-28

    Sulfonamides (SAs) were electrochemically investigated using cyclic voltammetry at a boron-doped diamond (BDD) electrode. Comparison experiments were carried out using a glassy carbon electrode. The BDD electrode provided well-resolved oxidation, irreversible cyclic voltammograms and higher current signals when compared to the glassy carbon electrode. Results obtained from using the BDD electrode in a flow injection system coupled with amperometric detection were illustrated. The optimum potential from a hydrodynamic voltammogram was found to be 1100mV versus Ag/AgCl, which was chosen for the HPLC-amperometric system. Excellent results of linear range and detection limit were obtained. This method was also used for determination of sulfonamides in egg samples. The standard solutions of 5, 10, and 15ppm were spiked in a real sample, and percentage of recoveries was found to be between 90.0 and 107.7.

  16. Hydrogenation effects on carrier transport in boron-doped ultrananocrystalline diamond/amorphous carbon films prepared by coaxial arc plasma deposition

    Energy Technology Data Exchange (ETDEWEB)

    Katamune, Yūki, E-mail: yuki-katamune@kyudai.jp; Takeichi, Satoshi [Department of Applied Science for Electronics and Materials, Kyushu University, 6-1 Kasuga, Fukuoka 816-8580 (Japan); Ohmagari, Shinya [Diamond Research Group, Research Institute for Ubiquitous Energy Devices (UBIQEN), National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577 (Japan); Yoshitake, Tsuyoshi, E-mail: tsuyoshi-yoshitake@kyudai.jp [Department of Applied Science for Electronics and Materials, Kyushu University, 6-1 Kasuga, Fukuoka 816-8580 (Japan); Research Center for Synchrotron Light Applications, Kyushu University, 6-1 Kasuga 816-8580 (Japan); Research and Education Center for Advanced Energy, Materials, Devices, and Systems, Kyushu University, 6-1 Kasuga 816-8580 (Japan)

    2015-11-15

    Boron-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C:H) films were deposited by coaxial arc plasma deposition with a boron-blended graphite target at a base pressure of <10{sup −3} Pa and at hydrogen pressures of ≤53.3 Pa. The hydrogenation effects on the electrical properties of the films were investigated in terms of chemical bonding. Hydrogen-scattering spectrometry showed that the maximum hydrogen content was 35 at. % for the film produced at 53.3-Pa hydrogen pressure. The Fourier-transform infrared spectra showed strong absorptions by sp{sup 3} C–H bonds, which were specific to the UNCD/a-C:H, and can be attributed to hydrogen atoms terminating the dangling bonds at ultrananocrystalline diamond grain boundaries. Temperature-dependence of the electrical conductivity showed that the films changed from semimetallic to semiconducting with increasing hydrogen pressure, i.e., with enhanced hydrogenation, probably due to hydrogenation suppressing the formation of graphitic bonds, which are a source of carriers. Carrier transport in semiconducting hydrogenated films can be explained by a variable-range hopping model. The rectifying action of heterojunctions comprising the hydrogenated films and n-type Si substrates implies carrier transport in tunneling.

  17. High-sensitivity non-enzymatic glucose biosensor based on Cu(OH){sub 2} nanoflower electrode covered with boron-doped nanocrystalline diamond layer

    Energy Technology Data Exchange (ETDEWEB)

    Sim, Huijun [Department of Chemical and Biological Engineering, Korea University, 1, 5-Ga, Anam-dong, Sungbuk-ku, Seoul 136-713 (Korea, Republic of); Kim, Jong-Hoon; Lee, Seung-Koo; Song, Min-Jung [School of Material and Science Engineering, Korea University, 1, 5-Ga, Anam-dong, Sungbuk-ku, Seoul 136-713 (Korea, Republic of); Yoon, Dong-Hwa [Department of Chemical and Biological Engineering, Korea University, 1, 5-Ga, Anam-dong, Sungbuk-ku, Seoul 136-713 (Korea, Republic of); Lim, Dae-Soon [School of Material and Science Engineering, Korea University, 1, 5-Ga, Anam-dong, Sungbuk-ku, Seoul 136-713 (Korea, Republic of); Hong, Suk-In, E-mail: sihong@korea.ac.kr [Department of Chemical and Biological Engineering, Korea University, 1, 5-Ga, Anam-dong, Sungbuk-ku, Seoul 136-713 (Korea, Republic of)

    2012-10-01

    A non-enzymatic biosensor was developed using boron-doped nanocrystalline diamond (BDND) based on a Cu electrode with Cu(OH){sub 2} dendritic architecture. The Cu(OH){sub 2} nanoflower electrode was covered with a BDND layer using an electrostatic self-assembly seeding method with nanodiamond particles and hot-filament chemical vapor deposition. X-ray diffraction and Raman spectral analysis confirmed that the BDND nanoflower electrode was synthesized onto Cu(OH){sub 2} nanoflowers. Field-emission scanning electron microscope images showed that the fabricated electrodes were nanoflowers possessing large surface areas. From cyclic voltammetry, the peak currents of an BDND/Cu(OH){sub 2}/Cu electrode was about 7, 6.2, and 5.9 times higher than that of the Cu foil, Cu(OH){sub 2}/Cu, and BDND/Cu electrodes, respectively. A biosensor based on BDND/Cu(OH){sub 2}/Cu exhibited excellent performance for glucose detection, and it had a linear detection range of 0 to 6 mM, a correlation coefficient of 0.9994, a low detection limit of 9 {mu}M, and a high sensitivity of 2.1592 mA mM{sup -1} cm{sup -1}. - Highlights: Black-Right-Pointing-Pointer Deposition of boron-doped nanocrystalline diamond on Cu(OH){sub 2} nanoflowers Black-Right-Pointing-Pointer Damage-free seeding process using electrostatic self-assembly seeding method Black-Right-Pointing-Pointer Non-enzymatic glucose sensor with high sensitivity of 2.1592 mA mM{sup -1} cm{sup -1}.

  18. Low-Temperature Softening Due to Vacancy Orbital with Γ8 Quartet Ground State in Boron-Doped Floating Zone Silicon

    Science.gov (United States)

    Baba, Shotaro; Akatsu, Mitsuhiro; Mitsumoto, Keisuke; Komatsu, Satoru; Horie, Kunihiko; Nemoto, Yuichi; Yamada-Kaneta, Hiroshi; Goto, Terutaka

    2013-08-01

    We have carried out low-temperature ultrasonic measurements using shear-mode ultrasound to clarify the quantum state of a vacancy orbital in boron-doped silicon grown by the floating zone (FZ) method. The elastic constants (C11-C12)/2 and C44 of the transverse mode exhibit considerable softening below 2 and 5 K down to the base temperature of 30 mK, respectively. The elastic constant C44 measured by the three ultrasonic modes (kx,uy), (kz,ux), and (kx,uz) shows the different magnetic field dependences among the configurations under applied magnetic fields along the z-axis. The elastic softening and the magnetic field dependence of the elastic constants are accounted for by the quadrupole susceptibility based on the energy level scheme of the vacancy orbital with a Γ8 quartet ground state and Γ7 doublet excited state located at an energy of 1 K. The difference in C44 between the two ultrasonic modes (kz,ux) and (kx,uz) at fields along the z-axis indicates that the Γ8 quartet ground state is slightly split by local strain in the silicon sample. The quantum state of the vacancy orbital is expected to be sensitive to strain because of the extremely large quadrupole-strain coupling energy of gΓ≈ 105 K due to the extensively spreading orbital radius of r≈ 1 nm. The differences in variation of the low-temperature softening and magnetic field dependence among eight samples cut out from different locations of the present boron-doped FZ silicon ingot evidence the inhomogeneous distribution of the vacancy concentration.

  19. Boron, bismuth co-doping of gallium arsenide and other compounds for photonic and heterojunction bipolar transistor devices

    Science.gov (United States)

    Mascarenhas, Angelo

    2015-07-07

    Isoelectronic co-doping of semiconductor compounds and alloys with acceptors and deep donors is sued to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. For example, Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, B and Bi, to customize solar cells, and other semiconductor devices. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  20. Substrate and method for the formation of continuous magnesium diboride and doped magnesium diboride wire

    Science.gov (United States)

    Suplinskas, Raymond J.; Finnemore, Douglas; Bud'ko, Serquei; Canfield, Paul

    2007-11-13

    A chemically doped boron coating is applied by chemical vapor deposition to a silicon carbide fiber and the coated fiber then is exposed to magnesium vapor to convert the doped boron to doped magnesium diboride and a resultant superconductor.

  1. Study of the effect of boron doping on the solid phase crystallisation of hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Westra, J.M.; Swaaij, R.A.C.M.M. van [Photovoltaic Materials and Devices, Department of Sustainable Electrical Energy, Delft University of Technology, Delft (Netherlands); Šutta, P. [New Technologies-Research Centre, University of West Bohemia, Plzen (Czech Republic); Sharma, K.; Creatore, M. [Department of Applied Physics, Eindhoven University of Technology, Eindhoven (Netherlands); Zeman, M. [Photovoltaic Materials and Devices, Department of Sustainable Electrical Energy, Delft University of Technology, Delft (Netherlands)

    2014-10-01

    Thin-film polycrystalline silicon on glass obtained by crystallization of hydrogenated amorphous silicon (a-Si:H) films is an interesting alternative for thin-film silicon solar cells. Although the solar-cell efficiencies are still limited, this technique offers excellent opportunity to study the influence of B-doping on the crystallisation process of a-Si:H. Our approach is to slowly crystallize B-doped a-Si:H films by solid phase crystallization in the temperature range 580–600°C. We use plasma-enhanced chemical vapour deposition (PECVD) and expanding thermal plasma chemical vapour deposition (ETPCVD) for the B-doped a-Si:H deposition. In this work we show the first in-situ study of the crystallization process of B-doped a-Si:H films produced by ETPCVD and make a comparison to the crystallization of intrinsic ETPCVD deposited a-Si:H as well as intrinsic and B-doped a-Si:H films deposited by PECVD. The crystallization process is investigated by in-situ x-ray diffraction, using a high temperature chamber for the annealing procedure. The study shows a strong decrease in the time required for full crystallisation for B-doped a-Si:H films compared to the intrinsic films. The time before the onset of crystallisation is reduced by the incorporation of B as is the grain growth velocity. The time to full crystallisation can be manipulated by the B{sub 2}H{sub 6}-to-SiH{sub 4} ratio used during the deposition and by the microstructure of the as-deposited a-Si:H films. - Highlights: • Solid-phase crystallization of B-doped a-Si:H films is presented. • Crystallization study of B-doped and intrinsic a-Si:H by in-situ x-ray diffraction • The microstructure and B-doping of a-Si:H influences the crystallisation process. • B enhances the grain growth rate, but the effect on the nucleation rate is limited.

  2. Boron-doped peroxo-zirconium oxide dielectric for high-performance, low-temperature, solution-processed indium oxide thin-film transistor.

    Science.gov (United States)

    Park, Jee Ho; Yoo, Young Bum; Lee, Keun Ho; Jang, Woo Soon; Oh, Jin Young; Chae, Soo Sang; Lee, Hyun Woo; Han, Sun Woong; Baik, Hong Koo

    2013-08-28

    We developed a solution-processed indium oxide (In2O3) thin-film transistor (TFT) with a boron-doped peroxo-zirconium (ZrO2:B) dielectric on silicon as well as polyimide substrate at 200 °C, using water as the solvent for the In2O3 precursor. The formation of In2O3 and ZrO2:B films were intensively studied by thermogravimetric differential thermal analysis (TG-DTA), attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FT IR), high-resolution X-ray diffraction (HR-XRD), and X-ray photoelectron spectroscopy (XPS). Boron was selected as a dopant to make a denser ZrO2 film. The ZrO2:B film effectively blocked the leakage current at 200 °C with high breakdown strength. To evaluate the ZrO2:B film as a gate dielectric, we fabricated In2O3 TFTs on the ZrO2:B dielectrics with silicon substrates and annealed the resulting samples at 200 and 250 °C. The resulting mobilities were 1.25 and 39.3 cm(2)/(V s), respectively. Finally, we realized a flexible In2O3 TFT with the ZrO2:B dielectric on a polyimide substrate at 200 °C, and it successfully operated a switching device with a mobility of 4.01 cm(2)/(V s). Our results suggest that aqueous solution-processed In2O3 TFTs on ZrO2:B dielectrics could potentially be used for low-cost, low-temperature, and high-performance flexible devices.

  3. Highly conducting and preferred oriented boron doped nc-Si films for window layers in nc-Si solar cells

    Science.gov (United States)

    Mondal, Praloy; Das, Debajyoti

    2016-05-01

    Growth and optimization of the boron dopednanocrystalline silicon (nc-Si) films have been studied by varyingthe gaspressure applied to the hydrogendiluted silane plasma in RF (13.56 MHz) plasma-enhanced chemical vapor deposition (PECVD) system, using diborane (B2H6) as the dopant gas. High magnitudeof electrical conductivity (~102 S cm-1) andorientedcrystallographic lattice planes have been obtained with high crystalline volume fraction (~86 %) at an optimum pressure of 2.5 Torr. XRD and Raman studies reveal good crystallinity with preferred orientation, suitable for applications in stacked layer devices, particularly in nc-Si solar cells.

  4. The effect of boron doping on the magnetostriction of Fe-Ga and Fe-Al samples

    Energy Technology Data Exchange (ETDEWEB)

    Doerr, Mathias; Granovsky, Sergey; Loewenhaupt, Michael [TU Dresden, Institut fuer Festkoerperphysik (Germany); Teodoro dos Santos, Claudio; Bormio-Nunes, Cristina [Universidade de Sao Paulo, Escola de Engenharia de Lorena, Lorena (Brazil)

    2011-07-01

    Fe-Ga (Galfenol) based alloys are used in a number of magnetomechanical applications because of the high magnetostriction values of more than 100 ppm at room temperature. The addition of boron inhibits the crystallographic ordering of the alloys and stabilizes the disordered A2 structure that is responsible for the high striction values. Especially, polycrystalline and rapid cooled Fe-Ga-B and Fe-Al-B samples were investigated in our project. Magnetization and longitudinal as well as transversal magnetostriction measurements at temperatures of 5 K, 80 K and 300 K show a similar effect of the amount of B as found on single crystals. Whereas the saturation magnetization is nearly the same and mainly determined by the Fe content, a dependence of the striction values on the amount of B is visible (more than 10% in the Fe-Al system). The results illustrate the influence of the stoichiometry and the preparation conditions on the magnetomechanical properties.

  5. Molecular Signature of Pseudomonas aeruginosa with Simultaneous Nanomolar Detection of Quorum Sensing Signaling Molecules at a Boron-Doped Diamond Electrode

    Science.gov (United States)

    Buzid, Alyah; Shang, Fengjun; Reen, F. Jerry; Muimhneacháin, Eoin Ó.; Clarke, Sarah L.; Zhou, Lin; Luong, John H. T.; O’Gara, Fergal; McGlacken, Gerard P.; Glennon, Jeremy D.

    2016-07-01

    Electroanalysis was performed using a boron-doped diamond (BDD) electrode for the simultaneous detection of 2-heptyl-3-hydroxy-4-quinolone (PQS), 2-heptyl-4-hydroxyquinoline (HHQ) and pyocyanin (PYO). PQS and its precursor HHQ are two important signal molecules produced by Pseudomonas aeruginosa, while PYO is a redox active toxin involved in virulence and pathogenesis. This Gram-negative and opportunistic human pathogen is associated with a hospital-acquired infection particularly in patients with compromised immunity and is the primary cause of morbidity and mortality in cystic fibrosis (CF) patients. Early detection is crucial in the clinical management of this pathogen, with established infections entering a biofilm lifestyle that is refractory to conventional antibiotic therapies. Herein, a detection procedure was optimized and proven for the simultaneous detection of PYO, HHQ and PQS in standard mixtures, biological samples, and P. aeruginosa spiked CF sputum samples with remarkable sensitivity, down to nanomolar levels. Differential pulse voltammetry (DPV) scans were also applicable for monitoring the production of PYO, HHQ and PQS in P. aeruginosa PA14 over 8 h of cultivation. The simultaneous detection of these three compounds represents a molecular signature specific to this pathogen.

  6. Electro-fenton and photoelectro-fenton degradation of sulfanilic acid using a boron-doped diamond anode and an air diffusion cathode.

    Science.gov (United States)

    El-Ghenymy, Abdellatif; Garrido, José Antonio; Centellas, Francesc; Arias, Conchita; Cabot, Pere Lluís; Rodríguez, Rosa María; Brillas, Enric

    2012-04-01

    The mineralization of sulfanilic acid has been studied by electro-Fenton (EF) and photoelectro-Fenton (PEF) reaction with UVA light using an undivided electrochemical cell with a boron-doped diamond (BDD) anode and an air diffusion cathode able to generate H(2)O(2). Organics were then oxidized by hydroxyl radicals formed at the anode surface from water oxidation and in the bulk from Fenton's reaction between generated H(2)O(2) and added Fe(2+). The UVA irradiation in PEF enhanced the production of hydroxyl radicals in the bulk, accelerating the removal of organics and photodecomposed intermediates like Fe(III)-carboxylate complexes. Partial decontamination of 1.39 mM sulfanilic acid solutions was achieved by EF until 100 mA cm(-2) at optimum conditions of 0.4 mM Fe(2+) and pH 3.0. The increase in current density and substrate content led to an almost total mineralization. In contrast, the PEF process was more powerful, yielding almost complete mineralization in less electrolysis time under comparable conditions. The kinetics for sulfanilic acid decay always followed a pseudo-first-order reaction. Hydroquinone and p-benzoquinone were detected as aromatic intermediates, whereas acetic, maleic, formic, oxalic, and oxamic acids were identified as generated carboxylic acids. NH(4)(+) ion was preferentially released in both treatments, along with NO(3)(-) ion in smaller proportion.

  7. Electrochemical treatment of phenolic waters in presence of chloride with boron-doped diamond (BDD) anodes: Experimental study and mathematical model

    Energy Technology Data Exchange (ETDEWEB)

    Mascia, Michele, E-mail: michele.mascia@unica.it [Dipartimento di Ingegneria Chimica e Materiali, Universita di Cagliari Piazza d' Armi 09123 Cagliari (Italy); Vacca, Annalisa; Polcaro, Anna Maria; Palmas, Simonetta; Ruiz, Jesus Rodriguez; Da Pozzo, Anna [Dipartimento di Ingegneria Chimica e Materiali, Universita di Cagliari Piazza d' Armi 09123 Cagliari (Italy)

    2010-02-15

    This work deals with an experimental and numerical study on the electrochemical treatment of waters containing phenolic compounds with boron-doped diamond (BDD) anodes. Anodic oxidation of m-cresol, as a model of phenolic compound, was investigated by galvanostatic electrolyses. The electrolyses were carried out under different experimental conditions by using an impinging-jet flow cell inserted in a hydraulic circuit in a closed loop. On the basis of the experimental results a mathematical model was implemented to simulate the effect of the chemistry of organic compounds and solution on the process, in particular the effect of chlorides on the kinetics of m-cresol oxidation. The effect of hydrodynamics of the cell on the mass transfer towards the electrode surface was also considered. The model was validated through comparison with experimental data: the results showed that the proposed model well interpreted the complex effect on removal efficiency of such operative parameters as current density, hydrodynamic of the reactor and chemistry of the solution. The model predictions were utilised to obtain quantitative information on the reaction mechanism, as well as to predict the performance of the process under different operative conditions, by calculating some relevant figures of merit.

  8. Study of degradation intermediates formed during electrochemical oxidation of pesticide residue 2,6-dichlorobenzamide (BAM) at boron doped diamond (BDD) and platinum-iridium anodes.

    Science.gov (United States)

    Madsen, Henrik Tækker; Søgaard, Erik Gydesen; Muff, Jens

    2014-08-01

    Electrochemical oxidation is a promising technique for degradation of otherwise recalcitrant organic micropollutants in waters. In this study, the applicability of electrochemical oxidation was investigated concerning the degradation of the groundwater pollutant 2,6-dichlorobenzamide (BAM) through the electrochemical oxygen transfer process with two anode materials: Ti/Pt90-Ir10 and boron doped diamond (Si/BDD). Besides the efficiency of the degradation of the main pollutant, it is also of outmost importance to control the formation and fate of stable degradation intermediates. These were investigated quantitatively with HPLC-MS and TOC measurements and qualitatively with a combined HPLC-UV and HPLC-MS protocol. 2,6-Dichlorobenzamide was found to be degraded most efficiently by the BDD cell, which also resulted in significantly lower amounts of intermediates formed during the process. The anodic degradation pathway was found to occur via substitution of hydroxyl groups until ring cleavage leading to carboxylic acids. For the BDD cell, there was a parallel cathodic degradation pathway that occurred via dechlorination. The combination of TOC with the combined HPLC-UV/MS was found to be a powerful method for determining the amount and nature of degradation intermediates. PMID:24873711

  9. The improvement of boron-doped diamond anode system in electrochemical degradation of p-nitrophenol by zero-valent iron

    International Nuclear Information System (INIS)

    Boron-doped diamond (BDD) electrodes are promising anode materials in electrochemical treatment of wastewaters containing bio-refractory organic compounds due to their strong oxidation capability and remarkable corrosion stability. In order to further improve the performance of BDD anode system, electrochemical degradation of p-nitrophenol were initially investigated at the BDD anode in the presence of zero-valent iron (ZVI). The results showed that under acidic condition, the performance of BDD anode system containing zero-valent iron (BDD-ZVI system) could be improved with the joint actions of electrochemical oxidation at the BDD anode (39.1%), Fenton's reaction (28.5%), oxidation–reduction at zero-valent iron (17.8%) and coagulation of iron hydroxides (14.6%). Moreover, it was found that under alkaline condition the performance of BDD-ZVI system was significantly enhanced, mainly due to the accelerated release of Fe(II) ions from ZVI and the enhanced oxidation of Fe(II) ions. The dissolved oxygen concentration was significantly reduced by reduction at the cathode, and consequently zero-valent iron corroded to Fe(II) ions in anaerobic highly alkaline environments. Furthermore, the oxidation of released Fe(II) ions to Fe(III) ions and high-valent iron species (e.g., FeO2+, FeO42−) was enhanced by direct electrochemical oxidation at BDD anode.

  10. Electrochemical Imprinted Polycrystalline Nickel-Nickel Oxide Half-Nanotube-Modified Boron-Doped Diamond Electrode for the Detection of L-Serine.

    Science.gov (United States)

    Dai, Wei; Li, Hongji; Li, Mingji; Li, Cuiping; Wu, Xiaoguo; Yang, Baohe

    2015-10-21

    This paper presents a novel and versatile method for the fabrication of half nanotubes (HNTs) using a flexible template-based nanofabrication method denoted as electrochemical imprinting. With use of this method, polycrystalline nickel and nickel(II) oxide (Ni-NiO) HNTs were synthesized using pulsed electrodeposition to transfer Ni, deposited by radio frequency magnetron sputtering on a porous polytetrafluoroethylene template, onto a boron-doped diamond (BDD) film. The Ni-NiO HNTs exhibited semicircular profiles along their entire lengths, with outer diameters of 50-120 nm and inner diameters of 20-50 nm. The HNT walls were formed of Ni and NiO nanoparticles. A biosensor for the detection of L-serine was fabricated using a BDD electrode modified with Ni-NiO HNTs, and the device demonstrated satisfactory analytical performance with high sensitivity (0.33 μA μM(-1)) and a low limit of detection (0.1 μM). The biosensor also exhibited very good reproducibility and stability, as well as a high anti-interference ability against amino acids such as L-leucine, L-tryptophan, L-cysteine, L-phenylalanine, L-arginine, and L-lysine.

  11. Demonstration Of Electrochemical Oxidation Of Oils Using Boron-Doped Diamond Electrodes And Its Potential Role In The Disposal Of Radioactively Contaminated Waste Lubricants

    International Nuclear Information System (INIS)

    Electrochemical oxidation using a boron-doped diamond (BDD) anode is being investigated as a possible method for treating radiologically-contaminated oils. It has the potential to oxidise oils to carbon dioxide and water, and it would be particularly beneficial for oils contaminated with plutonium. It was found that simultaneous application of sonication and electro-oxidation produced and maintained an oil emulsion, so enabling its oxidation. This treatment was shown to be effective with 3 different oils: an unused hydraulic oil, an unused vacuum pump oil and a waste used machine tool oil, although the addition of a small amount of surfactant was required for the effective emulsification and oxidation of the vacuum pump oil. Essentially complete oxidation of the hydraulic oil in the absence of other organic material was demonstrated. The rate of oxidation appeared to be limited by the applied current when the concentration of oil was high and the current was low. Similarly, it was limited by the oil concentration when the concentration of oil was low and the current was relatively high. The required scale-up from a laboratory electrochemical cell is estimated to be 10,000 fold, which could entail a cell with a total BDD surface area of 3 m2, drawing a current of about 2000 A. It is anticipated that it should be possible to minimise the size of the cell by optimisation during the design of the prototype equipment. (authors)

  12. Molecular Signature of Pseudomonas aeruginosa with Simultaneous Nanomolar Detection of Quorum Sensing Signaling Molecules at a Boron-Doped Diamond Electrode

    Science.gov (United States)

    Buzid, Alyah; Shang, Fengjun; Reen, F. Jerry; Muimhneacháin, Eoin Ó; Clarke, Sarah L.; Zhou, Lin; Luong, John H. T.; O’Gara, Fergal; McGlacken, Gerard P.; Glennon, Jeremy D.

    2016-01-01

    Electroanalysis was performed using a boron-doped diamond (BDD) electrode for the simultaneous detection of 2-heptyl-3-hydroxy-4-quinolone (PQS), 2-heptyl-4-hydroxyquinoline (HHQ) and pyocyanin (PYO). PQS and its precursor HHQ are two important signal molecules produced by Pseudomonas aeruginosa, while PYO is a redox active toxin involved in virulence and pathogenesis. This Gram-negative and opportunistic human pathogen is associated with a hospital-acquired infection particularly in patients with compromised immunity and is the primary cause of morbidity and mortality in cystic fibrosis (CF) patients. Early detection is crucial in the clinical management of this pathogen, with established infections entering a biofilm lifestyle that is refractory to conventional antibiotic therapies. Herein, a detection procedure was optimized and proven for the simultaneous detection of PYO, HHQ and PQS in standard mixtures, biological samples, and P. aeruginosa spiked CF sputum samples with remarkable sensitivity, down to nanomolar levels. Differential pulse voltammetry (DPV) scans were also applicable for monitoring the production of PYO, HHQ and PQS in P. aeruginosa PA14 over 8 h of cultivation. The simultaneous detection of these three compounds represents a molecular signature specific to this pathogen. PMID:27427496

  13. Direct electrochemistry of Shewanella loihica PV-4 on gold nanoparticles-modified boron-doped diamond electrodes fabricated by layer-by-layer technique.

    Science.gov (United States)

    Wu, Wenguo; Xie, Ronggang; Bai, Linling; Tang, Zuming; Gu, Zhongze

    2012-05-01

    Microbial Fuel Cells (MFCs) are robust devices capable of taping biological energy, converting pollutants into electricity through renewable biomass. The fabrication of nanostructured electrodes with good bio- and electrochemical activity, play a profound role in promoting power generation of MFCs. Au nanoparticles (AuNPs)-modified Boron-Doped Diamond (BDD) electrodes are fabricated by layer-by-layer (LBL) self-assembly technique and used for the direct electrochemistry of Shewanella loihica PV-4 in an electrochemical cell. Experimental results show that the peak current densities generated on the Au/PAH multilayer-modified BDD electrodes increased from 1.25 to 2.93 microA/cm(-2) as the layer increased from 0 to 6. Different cell morphologies of S. loihica PV-4 were also observed on the electrodes and the highest density of cells was attached on the (Au/PAH)6/BDD electrode with well-formed three-dimensional nanostructure. The electrochemistry of S. loihica PV-4 was enhanced on the (Au/PAH)4/BDD electrode due to the appropriate amount of AuNPsand thickness of PAH layer.

  14. Ag Nanoparticles on Boron Doped Multi-walled Carbon Nanotubes as a Synergistic Catalysts for Oxygen Reduction Reaction in Alkaline Media

    International Nuclear Information System (INIS)

    Highlights: • The mass activity of Ag/B-MWCNTs reduces with increasing of Ag loading. • The B-MWCNTs can be a promising supporting material for low-cost ORR catalyst. • This work the role of supporting materials in reducing the loading of metal catalyst. - Abstract: Here we report the oxygen reduction reaction (ORR) activity of Ag nanoparticles supported on boron doped multi-walled carbon nanotubes (Ag/B-MWCNTs) with different Ag loadings synthesized by a facile chemical method. Transmission electron microscopy (TEM) and X-ray diffraction patterns (XRD) measurements were employed to investigate the morphology and crystal structure of the as-prepared catalysts. The electrochemical results demonstrated that all the Ag/B-MWCNTs samples catalyzed the ORR in alkaline media by an efficient four-electron pathway. Furthermore, Ag/B-MWCNTs with lowest Ag loading (20%) performed the highest mass activity towards ORR mainly due to the synergistic effect of Ag nanoparticles and B-MWCNTs. This work brings insight into the role of supporting materials in reducing the loading of metal catalyst towards low-cost ORR in alkaline media

  15. In situ control of local pH using a boron doped diamond ring disk electrode: optimizing heavy metal (mercury) detection.

    Science.gov (United States)

    Read, Tania L; Bitziou, Eleni; Joseph, Maxim B; Macpherson, Julie V

    2014-01-01

    A novel electrochemical approach to modifying aqueous solution pH in the vicinity of a detector electrode in order to optimize the electrochemical measurement signal is described. A ring disk electrode was employed where electrochemical decomposition of water on the ring was used to generate a flux of protons which adjusts the local pH controllably and quantifiably at the disk. Boron doped diamond (BDD) functioned as the electrode material given the stability of this electrode surface especially when applying high potentials (to electrolyze water) for significant periods of time. A pH sensitive iridium oxide electrode electrodeposited on the disk electrode demonstrated that applied positive currents on the BDD ring, up to +50 μA, resulted in a local pH decrease of over 4 orders of magnitude, which remained stable over the measurement time of 600 s. pH generation experiments were found to be in close agreement with finite element simulations. The dual electrode arrangement was used to significantly improve the stripping peak signature for Hg in close to neutral conditions by the generation of pH = 2.0, locally. With the ability to create a localized pH change electrochemically in the vicinity of the detector electrode, this system could provide a simple method for optimized analysis at the source, e.g., river and sea waters. PMID:24321045

  16. Magnetism and the absence of superconductivity in the praseodymium–silicon system doped with carbon and boron

    Energy Technology Data Exchange (ETDEWEB)

    Venta, J. de la, E-mail: jdelaventa@physics.ucsd.edu [Department of Physics and Center for Advanced Nanoscience, University of California, La Jolla, San Diego, CA 92093 (United States); Basaran, Ali C. [Department of Physics and Center for Advanced Nanoscience, University of California, La Jolla, San Diego, CA 92093 (United States); Materials Science and Engineering, University of California, La Jolla, San Diego, CA 92093 (United States); Grant, T. [Department of Physics and Astronomy, University of California, Irvine, CA 92697 (United States); Gallardo-Amores, J.M. [Departamento de Quimica Inorganica I, Universidad Complutense, E-28040 Madrid (Spain); Ramirez, J.G. [Department of Physics and Center for Advanced Nanoscience, University of California, La Jolla, San Diego, CA 92093 (United States); Alario-Franco, M.A. [Departamento de Quimica Inorganica I, Universidad Complutense, E-28040 Madrid (Spain); Fisk, Z. [Department of Physics and Astronomy, University of California, Irvine, CA 92697 (United States); Schuller, Ivan K. [Department of Physics and Center for Advanced Nanoscience, University of California, La Jolla, San Diego, CA 92093 (United States)

    2013-08-15

    We searched for new structural, magnetic and superconductivity phases in the Pr–Si system using high-pressure high-temperature and arc melting syntheses. Both high and low Si concentration areas of the phase diagram were explored. Although a similar approach in the La–Si system produced new stable superconducting phases, in the Pr–Si system we did not find any new superconductors. At low Si concentrations, the arc-melted samples were doped with C or B. It was found that addition of C gave rise to multiple previously unknown ferromagnetic phases. Furthermore, X-ray refinement of the undoped samples confirmed the existence of the so far elusive Pr{sub 3}Si{sub 2} phase. - Highlights: • Study of the Pr–Si system using HP–HT or doping with C and B. • New magnetic phases in the Pr–Si system doped with C. • Confirmation of the existence of the Pr{sub 3}Si{sub 2} phase.

  17. Boron-nitrogen doped carbon scaffolding: organic chemistry, self-assembly and materials applications of borazine and its derivatives.

    Science.gov (United States)

    Bonifazi, Davide; Fasano, Francesco; Lorenzo-Garcia, M Mercedes; Marinelli, Davide; Oubaha, Hamid; Tasseroul, Jonathan

    2015-10-25

    Discovered by Stock and Pohland in 1926, borazine is the isoelectronic and isostructural inorganic analogue of benzene, where the C[double bond, length as m-dash]C bonds are substituted by B-N bonds. The strong polarity of such heteroatomic bonds widens the HOMO-LUMO gap of the molecule, imparting strong UV-emitting/absorption and electrical insulating properties. These properties make borazine and its derivatives valuable molecular scaffolds to be inserted as doping units in graphitic-based carbon materials to tailor their optoelectronic characteristics, and specifically their semiconducting properties. By guiding the reader through the most significant examples in the field, in this feature paper we describe the past and recent developments in the organic synthesis and functionalisation of borazine and its derivatives. These boosted the production of a large variety of tailored derivatives, broadening their use in optoelectronics, H2 storage and supramolecular functional architectures, to name a few.

  18. Influence of surface treatment and dopant concentration on field emission characteristics of boron-doped diamond thin films

    Energy Technology Data Exchange (ETDEWEB)

    Nagao, M.; Kondo, T.; Gotoh, Y.; Tsuji, H.; Ishikawa, J. [Department of Electronic Science and Engineering, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-01 (Japan); Miyata, K.; Kobashi, K. [Kobe Steel, Ltd., Electronics and Information Technology Laboratory, 5-5, 1-chome, Takatsuka-dai, Nishi-ku, Kobe 651-22 (Japan)

    1997-11-01

    Field emission characteristics of B-doped diamond thin films terminated with oxygen and hydrogen were investigated. The diamond thin films were prepared by microwave plasma chemical vapor deposition. The dependence of emission characteristics on the surface treatment and on the B concentration was investigated. The turn-on voltage required to extract a current of 0.1 nA depended on these preparation parameters. The emitters with lower B concentration emitted electrons at a lower turn-on voltage, and the H-terminated emitters had a lower turn-on voltage than O-terminated emitters. The analysis of the slope and the intercept of Fowler{endash}Nordheim plot revealed that the dependence of turn-on voltage on the surface treatment is due to the difference of emission barrier height, and that the dependence on B concentration is due not to the emission barrier height but to the surface morphology. {copyright} {ital 1997 American Institute of Physics.}

  19. Boronic acid functionalized N-doped carbon quantum dots as fluorescent probe for selective and sensitive glucose determination

    Science.gov (United States)

    Jiang, Guohua; Jiang, Tengteng; Li, Xia; Wei, Zheng; Du, Xiangxiang; Wang, Xiaohong

    2014-04-01

    Nitrogen doped carbon quantum dots (NCQDs) of about 10 nm in diameter have been obtained by hydrothermal reaction from collagen. Because of the superiority of water dispersion, low toxicity and ease of functionlization, the NCQDs were designed as a glucose sensor after covalent grafting by 3-aminophenylboronic (APBA) (APBA-NCQDs). The as-prepared APBA-NCQDs were imparted with glucose sensitivity and selectivity from other saccharides via fluorescence (FL) quenching effect at physiological pH and at room temperature, which show high sensitivity and specificity for glucose determination with a wide range from 1 mM to 14 mM. FL quenching mechanism of APBA-NCQDs was also investigated by adding an external quencher. The APBA-NCQDs-based platform is an environmentally friendly way to substitute inorganic quantum dots containing heavy metals which offer a facile and low cost detection method.

  20. Magnetism and the absence of superconductivity in the praseodymium–silicon system doped with carbon and boron

    Energy Technology Data Exchange (ETDEWEB)

    de la Venta, J.; Basaran, Ali C.; Grant, T.; Gallardo-Amores, J. M.; Ramirez, J. G.; Alario-Franco, M. A.; Fisk, Z.; Schuller, Ivan K.

    2013-08-01

    We searched for new structural, magnetic and superconductivity phases in the Pr–Si system using high-pressure high-temperature and arc melting syntheses. Both high and low Si concentration areas of the phase diagram were explored. Although a similar approach in the La–Si system produced new stable superconducting phases, in the Pr–Si system we did not find any new superconductors. At low Si concentrations, the arc-melted samples were doped with C or B. It was found that addition of C gave rise to multiple previously unknown ferromagnetic phases. Furthermore, X-ray refinement of the undoped samples confirmed the existence of the so far elusive Pr3Si2 phase.

  1. Boron- and phosphorus-doped silicon germanium alloy nanocrystals—Nonthermal plasma synthesis and gas-phase thin film deposition

    Directory of Open Access Journals (Sweden)

    David J. Rowe

    2014-02-01

    Full Text Available Alloyed silicon-germanium (SiGe nanostructures are the topic of renewed research due to applications in modern optoelectronics and high-temperature thermoelectric materials. However, common techniques for producing nanostructured SiGe focus on bulk processing; therefore little is known of the physical properties of SiGe nanocrystals (NCs synthesized from molecular precursors. In this letter, we synthesize and deposit thin films of doped SiGe NCs using a single, flow-through nonthermal plasma reactor and inertial impaction. Using x-ray and vibrational analysis, we show that the SiGe NC structure appears truly alloyed for Si1−xGex for 0.16 < x < 0.24, and quantify the atomic dopant incorporation within the SiGe NC films.

  2. Degradation of the beta-blocker propranolol by electrochemical advanced oxidation processes based on Fenton's reaction chemistry using a boron-doped diamond anode

    Energy Technology Data Exchange (ETDEWEB)

    Isarain-Chavez, Eloy; Rodriguez, Rosa Maria; Garrido, Jose Antonio; Arias, Conchita; Centellas, Francesc; Cabot, Pere Lluis [Laboratori d' Electroquimica dels Materials i del Medi Ambient, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Brillas, Enric, E-mail: brillas@ub.ed [Laboratori d' Electroquimica dels Materials i del Medi Ambient, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain)

    2010-12-15

    The electro-Fenton (EF) and photoelectro-Fenton (PEF) degradation of solutions of the beta-blocker propranolol hydrochloride with 0.5 mmol dm{sup -3} Fe{sup 2+} at pH 3.0 has been studied using a single cell with a boron-doped diamond (BDD) anode and an air diffusion cathode (ADE) for H{sub 2}O{sub 2} electrogeneration and a combined cell containing the above BDD/ADE pair coupled in parallel to a Pt/carbon felt (CF) cell. This naphthalene derivative can be mineralized by both methods with a BDD anode. Almost overall mineralization is attained for the PEF treatments, more rapidly with the combined system due to the generation of higher amounts of hydroxyl radical from Fenton's reaction by the continuous Fe{sup 2+} regeneration at the CF cathode, accelerating the oxidation of organics to Fe(III)-carboxylate complexes that are more quickly photolyzed by UVA light. The homologous EF processes are less potent giving partial mineralization. The effect of current density, pH and Fe{sup 2+} and drug concentrations on the oxidation power of PEF process in combined cell is examined. Propranolol decay follows a pseudo first-order reaction in most cases. Aromatic intermediates such as 1-naphthol and phthalic acid and generated carboxylic acids such as maleic, formic, oxalic and oxamic are detected and quantified by high-performance liquid chromatography. The chloride ions present in the starting solution are slowly oxidized at the BDD anode. In PEF treatments, all initial N of propranolol is completely transformed into inorganic ions, with predominance of NH{sub 4}{sup +} over NO{sub 3}{sup -} ion.

  3. Degradation of 4,6-dinitro-o-cresol from water by anodic oxidation with a boron-doped diamond electrode

    Energy Technology Data Exchange (ETDEWEB)

    Flox, Cristina [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Garrido, Jose Antonio [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Rodriguez, Rosa Maria [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Centellas, Francesc [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Cabot, Pere-Lluis [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Arias, Conchita [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Brillas, Enric [Laboratori de Ciencia i Tecnologia Electroquimica de Materials, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain)]. E-mail: brillas@ub.edu

    2005-06-10

    Anodic oxidation of 4,6-dinitro-o-cresol (DNOC) has been studied in a cell of 100 ml with a boron-doped diamond anode and a graphite cathode, both of 3-cm{sup 2} area. Solutions containing up to approximately 240 mg l{sup -1} of compound in the pH range 2.0-12.0 have been treated at 100, 300 and 450 mA between 15 and 50 deg C. Total mineralization is always achieved due to the great amount of hydroxyl radical ({center_dot}OH) produced as oxidant on the anode surface. Total organic carbon is more rapidly removed in acid medium, being the optimum pH 3.0. The degradation rate increases when temperature, current and DNOC concentration increase. However, at 100 mA depollution becomes more effective from 71 mg l{sup -1} of initial pollutant. A pseudo first-order kinetics for DNOC decay is always found by reversed-phase chromatography, with a rate constant practically independent of pH, as expected if the same electroactive species is oxidized in all media. Ion-exclusion chromatography allowed the detection of oxalic acid as the ultimate carboxylic acid. The mineralization process leads to the complete release of NO{sub 3} {sup -} ions from the destruction of nitroderivative intermediates. These products are oxidized simultaneously with accumulated oxalic acid up to the end of electrolyses. Comparative treatment of the same solutions with a Pt anode yields a quite poor depollution because of the generation of much lower amounts of reactive {center_dot}OH on its surface.

  4. Investigation of the synergistic effects for p-nitrophenol mineralization by a combined process of ozonation and electrolysis using a boron-doped diamond anode

    Energy Technology Data Exchange (ETDEWEB)

    Qiu, Cuicui [School of Environment, State Key Joint Laboratory of Environmental Simulation and Pollution Control, Tsinghua University, Beijing 100084 (China); Yuan, Shi [School of Environment, State Key Joint Laboratory of Environmental Simulation and Pollution Control, Tsinghua University, Beijing 100084 (China); Graduate School at Shenzhen, Tsinghua University, Shenzhen 518055 (China); Li, Xiang; Wang, Huijiao; Bakheet, Belal [School of Environment, State Key Joint Laboratory of Environmental Simulation and Pollution Control, Tsinghua University, Beijing 100084 (China); Komarneni, Sridhar [Department of Ecosystem Science and Management and Material Research Institute, 205 MRL Building, The Pennsylvania State University, University Park, PA 16802 (United States); Wang, Yujue, E-mail: wangyujue@tsinghua.edu.cn [School of Environment, State Key Joint Laboratory of Environmental Simulation and Pollution Control, Tsinghua University, Beijing 100084 (China); Graduate School at Shenzhen, Tsinghua University, Shenzhen 518055 (China)

    2014-09-15

    Graphical abstract: - Highlights: • Combining electrolysis with ozonation greatly enhances nitrophenol mineralization. • O{sub 3} can rapidly degrade nitrophenol to carboxylic acids in the bulk solution. • Carboxylic acids can be mineralized by ·OH generated from multiple sources in the electrolysis-O{sub 3} process. • Electrolysis and ozonation can compensate for each other's weakness on pollutant degradation. - Abstract: Electrolysis and ozonation are two commonly used technologies for treating wastewaters contaminated with nitrophenol pollutants. However, they are often handicapped by their slow kinetics and low yields of total organic carbon (TOC) mineralization. To improve TOC mineralization efficiency, we combined electrolysis using a boron-doped diamond (BDD) anode with ozonation (electrolysis-O{sub 3}) to treat a p-nitrophenol (PNP) aqueous solution. Up to 91% TOC was removed after 60 min of the electrolysis-O{sub 3} process. In comparison, only 20 and 44% TOC was respectively removed by individual electrolysis and ozonation treatment conducted under similar reaction conditions. The result indicates that when electrolysis and ozonation are applied simultaneously, they have a significant synergy for PNP mineralization. This synergy can be mainly attributed to (i) the rapid degradation of PNP to carboxylic acids (e.g., oxalic acid and acetic acid) by O{sub 3}, which would otherwise take a much longer time by electrolysis alone, and (ii) the effective mineralization of the ozone-refractory carboxylic acids to CO{sub 2} by ·OH generated from multiple sources in the electrolysis-O{sub 3} system. The result suggests that combining electrolysis with ozonation can provide a simple and effective way to mutually compensate the limitations of the two processes for degradation of phenolic pollutants.

  5. AFM studies and electrochemical characterization of boron-doped diamond surfaces modified with metal oxides by the sol-gel method

    International Nuclear Information System (INIS)

    Continuing previous investigations, direct surface modifications of boron-doped diamond (BDD) electrodes with metal oxides (PtOx, RuO2, IrO2 and PbO2) and with some mixed composites were carried out by the Sol-Gel technique. The materials were studied by atomic force microscopy (AFM) to determine their surface topologies and by electrochemical techniques to establish the catalytic activity towards the oxygen evolution reaction (OER) and also, for the PtOx and PtOx- RuO2 composites, the ethanol oxidation reactions in acid media. The stability of PtOx coating covered by a Nafiontrade mark film was also tested by long-term operation. The AFM results indicated sites of heterogeneous deposition and the electrochemical studies demonstrated that the active surface area changed considerably with the proposed method of modification. The IrO2/BDD electrode showed the best performance to the OER with the onset of the oxidation current at ∼1.4 V, a value 200 mV lower than for the PtOx/BDD electrode. The enhanced stability of PtOx/BDD electrodes achieved by the application of a Nafiontrade mark film and already reported in acid media was further proved using the ethanol oxidation reaction. Only a small loss of activity (6%) was observed after 4-hours electrolysis while one-thousand voltammetric cycles left the surface practically unchanged. In addition, preliminary studies for the same reaction on PtOx/BDD and PtOx-RuO2/ BDD electrodes demonstrated the excellent activity of these mixed Sol-Gel coatings on the BDD surface and the possibility of further investigations for practical applications. (author)

  6. 掺硼金刚石膜电极处理医院废水的研究%Study on Hospital Wastewater using Boron-doped Diamond Electrode

    Institute of Scientific and Technical Information of China (English)

    于鲁冀; 孔德芳; 王震; 杨强

    2013-01-01

    通过研究自制电解槽,利用掺硼金刚石膜电极(BDD)对医疗废水进行消毒实验研究.实验研究了电流密度、消毒时间及Cl-浓度对消毒效果的影响.实验结果表明:电流密度越大,消毒效果越好;消毒接触时间越长,消毒效果越好;Cl-浓度对消毒效果影响显著,医疗废水C1-质量浓度达到200 mg/L以上,消毒接触时间≥9s,出水即可满足GB 18466-2005《医疗机构水污染物排放标准》粪大肠茵群数均不得超过500 MPN/L.%Study on the disinfection effect of hospital wastewater using the boron-doped diamond film electrode (BDD) in the self-electrolyzer was carried out. The disinfection effect of current density, disinfection time and the concentration of CV were studied in this experiment. The results showed that the greater the electric current density is, the better disinfection effect will be. The longer the contact time is,the better disinfection effect will be. The concentration of Cl- is significant on the disinfection effect. When the concentration of Cl- in hospital wastewater is more than 200 mg/L as well as the disinfection contact time is more than 9 s,the effluent could meet the requirement of the Medical Institutions Sewage Discharge Standard (GB 18466—2005) in which the value of fecal coliform should be no more than 500 MPN/L.

  7. Diclofenac on boron-doped diamond electrode: from electroanalytical determination to prediction of the electrooxidation mechanism with HPLC-ESI/HRMS and computational simulations.

    Science.gov (United States)

    Lucas, Francisco Willian de S; Mascaro, Lucia H; Fill, Taicia P; Rodrigues-Filho, Edson; Franco-Junior, Edison; Homem-de-Mello, Paula; de Lima-Neto, Pedro; Correia, Adriana N

    2014-05-20

    Using square-wave voltammetry coupled to the boron-doped diamond electrode (BDDE), it was possible to develop an analytical methodology for identification and quantification of diclofenac (DCL) in tablets and synthetic urine. The electroanalytical procedure was validated, with results being statistically equal to those obtained by chromatographic standard method, showing linear range of 4.94 × 10(-7) to 4.43 × 10(-6) mol L(-1), detection limit of 1.15 × 10(-7) mol L(-1), quantification limit of 3.85 × 10(-7) mol L(-1), repeatability of 3.05% (n = 10), and reproducibility of 1.27% (n = 5). The association of electrochemical techniques with UV-vis spectroscopy, computational simulations and HPLC-ESI/HRMS led us to conclude that the electrooxidation of DCL on the BDDE involved two electrons and two protons, where the products are colorful and easily hydrolyzable dimers. Density functional theory calculations allowed to evaluate the stability of dimers A, B, and C, suggesting dimer C was more stable than the other two proposed structures, ca. 4 kcal mol(-1). The comparison of the dimers stabilities with the stabilities of the molecular ions observed in the MS, the compounds that showed retention time (RT) of 15.53, 21.44, and 22.39 min were identified as the dimers B, C, and A, respectively. Corroborating the observed chromatographic profile, dimer B had a dipole moment almost twice higher than that of dimers A and C. As expected, dimer B has really shorter RT than dimers A and C. The majority dimer was the A (71%) and the C (19.8%) should be the minority dimer. However, the minority was the dimer B, which was formed in the proportion of 9.2%. This inversion between the formation proportion of dimer B and dimer C can be explained by preferential conformation of the intermediaries (cation-radicals) on the surface.

  8. 硼掺杂金刚石电极及其电分析应用%Electroanalytical Applications of Boron Doped Diamond Electrode

    Institute of Scientific and Technical Information of China (English)

    高成耀; 常明; 李晓伟; 李翠平

    2011-01-01

    一种新电极材料的发明往往会推动电分析测试的发展.硼掺杂金刚石(BDD)电极在电分析中具备宽电势窗口、低背景电流、耐腐蚀稳定性高和低吸附的特点,因而在电分析化学中引起了广泛的兴趣.本文对BDD电极的制备、表征和基本电分析性质进行了介绍,并对其在毛细管电泳、生物传感电极、痕量金属离子检测、化学修饰电极及化学需氧量快速测定方面的应用进行了综述.%Discoveries of new materials have significant impact on development of new methods and instrumentation for eletroanalysis.Boron doped diamond (BDD) electrode occupies a special place as an electrode material with interesting applications in electroanalysis because of its superior properties such as a wide potential window, low background current responses, remarkable corrosion stability, an inert surface with low adsorption.BDD electrodes have attracted the interests of many researchers for electrophoresis.The object of this article is to discuss the recent results available in the literature concerning the application of BDD electrodes to electroanalysis such as capillary electrophoresis end-column detection, electrochemical biosensor, anodic stripping voltammetry for trace metal ion detection, modified diamond electrodes and chemical oxygen demand detection.

  9. Degradation of 4,6-dinitro-o-cresol from water by anodic oxidation with a boron-doped diamond electrode

    International Nuclear Information System (INIS)

    Anodic oxidation of 4,6-dinitro-o-cresol (DNOC) has been studied in a cell of 100 ml with a boron-doped diamond anode and a graphite cathode, both of 3-cm2 area. Solutions containing up to approximately 240 mg l-1 of compound in the pH range 2.0-12.0 have been treated at 100, 300 and 450 mA between 15 and 50 deg C. Total mineralization is always achieved due to the great amount of hydroxyl radical (·OH) produced as oxidant on the anode surface. Total organic carbon is more rapidly removed in acid medium, being the optimum pH 3.0. The degradation rate increases when temperature, current and DNOC concentration increase. However, at 100 mA depollution becomes more effective from 71 mg l-1 of initial pollutant. A pseudo first-order kinetics for DNOC decay is always found by reversed-phase chromatography, with a rate constant practically independent of pH, as expected if the same electroactive species is oxidized in all media. Ion-exclusion chromatography allowed the detection of oxalic acid as the ultimate carboxylic acid. The mineralization process leads to the complete release of NO3- ions from the destruction of nitroderivative intermediates. These products are oxidized simultaneously with accumulated oxalic acid up to the end of electrolyses. Comparative treatment of the same solutions with a Pt anode yields a quite poor depollution because of the generation of much lower amounts of reactive ·OH on its surface

  10. Filmes de diamante CVD dopado com boro. Parte I . Histórico, produção e caracterização Boron-doped CVD diamond films. Part I. History, production and characterization

    Directory of Open Access Journals (Sweden)

    Rita de Cássia Mendes de Barros

    2005-03-01

    Full Text Available This review presents a brief account concerning the production, characterization and evolution of the knowledge in the area of diamond and boron-doped diamond films. The most important methods used for the growth of these films, such as chemical vapor deposition and high pressure/high temperature systems, as well as the several kinds of reactors which can be employed are reviewed. However, larger emphasis is given to the CVD method. Morphological, structural and electric properties of these films, as well as their role in the performance of voltammetric electrodes for electrochemistry and electroanalytical chemistry are also discussed.

  11. Microstructure and superconducting properties of nanocarbon-doped internal Mg diffusion-processed MgB2 wires fabricated using different boron powders

    Science.gov (United States)

    Xu, Da; Wang, Dongliang; Li, Chen; Yuan, Pusheng; Zhang, Xianping; Yao, Chao; Dong, Chiheng; Huang, He; Ma, Yanwei; Oguro, Hidetoshi; Awaji, Satoshi; Watanabe, Kazuo

    2016-04-01

    MgB2/Nb/Monel monofilament wires were fabricated using four different boron powders by an internal Mg diffusion (IMD) process. The microstructure, morphology and the critical current density (J c) of the used boron powders and the formative MgB2 layers were analyzed and compared. It was found that the purity and particle size of the boron powder influence the superconducting properties of MgB2 wires; further that the optimized heat-treatment condition also depends on the quality of the boron powder. The highest J c was obtained in the MgB2 layer made using amorphous boron (AB) powder, although a certain amount of voids existed in the superconducting layer. The IMD-processed MgB2 layer fabricated using high-purity boron (HB) powder had also a high J c compared with the powder-in-tube (PIT) process and a few unreacted boron particles remained in it. MgB2 wire fabricated using low-purity boron (LB) powder had a high cost-performance ratio compared with the others, which is expected to allow the fabrication of large-scale and low-cost superconducting wires for practical application. However, the enhancement of the J c was not found in the MgB2 layer manufactured using the ball-milled LB (MLB) powder as expected due to the increased percentage of impurity.

  12. Reduction of tail state on boron doped hydrogenated amorphous silicon oxide films prepared at high hydrogen dilution.

    Science.gov (United States)

    Park, Jinjoo; Iftiquar, S M; Lee, Sunwha; Park, Hyeongsik; Shin, Chonghoon; Jung, Junhee; Lee, Youn-Jung; Balaji, Nagarajan; Yi, Junsin

    2013-12-01

    In this report, we have investigated on the defect state of diborane (B2H6) doped wide bandgap hydrogenated amorphous silicon oxide (p-type a-SiO:H) films prepared using silane (SiH4), hydrogen (H2) and nitrous oxide (N2O) in a radio frequency (RF) plasma enhanced chemical vapor deposition (PECVD) system with different hydrogen dilutions. The films prepared with higher hydrogen dilution show lower Urbach energy (Eu), lower microstructure (R*), lower short and medium range disorder (omegaTO, Gamma(TO), I(TA)/I(TO), I(LA)/I(TO)), higher dark conductivity (sigma d) and higher refractive index (n) with high optical gap (Eg). Eu decreases from 248 meV to 153 meV, and R* decreases from 0.46 to 0.26, Raman peak omegaTO-TO mode position shifts from 480.24 to 483.28, GammaTO-full width half maximum of omegaTO decreases from 78.16 to 63.87, I(TA)/I(TO)-the ratio of integrated area of TA and TO mode decreases from 0.624 to 0.474, I(LA)/I(TO)-the ratio of integrated area of LA and TO mode deceases from 0.272 to 0.151, sigma d increases from 4.6 x 10(-7) S/cm to 1.1 x 10(-6) S/cm, n increases from 3.70 to 3.86. Reduced Nd, Eu and R* at wide Eg indicates that the films are more useful for solar cell window layer. Applying this layer to a single junction solar cell shows open circuit voltage (Voc) = 0.80 V, short circuit current density (Jsc) = 16.3 mA/cm2, fill factor (FF) = 72%, efficiency (eta) = 9.4%. PMID:24266147

  13. Concentration and electrode material dependence of the voltammetric response of iodide on platinum, glassy carbon and boron-doped diamond in the room temperature ionic liquid 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide

    International Nuclear Information System (INIS)

    The electro-oxidation of iodide has been investigated as a function of concentration using steady-state microelectrode voltammetry, transient cyclic voltammetry and linear-sweep semi-integral voltammetry on platinum, glassy carbon and boron-doped diamond electrodes in the room temperature ionic liquid 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide. Two oxidation processes are observed on all of the investigated electrode materials, with the first being assigned to the oxidation of iodide to triiodide (confirmed by UV/visible spectroscopy) and the second being attributed to the oxidation of triiodide to iodine. Iodide oxidation is kinetically more facile on platinum compared to glassy carbon or boron-doped diamond. At elevated bulk iodide concentrations, the nucleation and growth of sparingly soluble electrogenerated iodine at the electrode surface was observed and imaged in situ using optical microscopy. The diffusion coefficient of iodide was determined to be 2.59 (±0.04) × 10−7 cm2 s−1 and independent of the bulk concentration of iodide. The steady-state iodide oxidation current measured at a platinum microelectrode was found to be a linear function of iodide concentration, as expected if there are no contributions from non-Stokesian mass-transport processes (electron hopping and/or Grotthuss-type exchange) under the investigated conditions

  14. Boronated mesophase pitch coke for lithium insertion

    Science.gov (United States)

    Frackowiak, E.; Machnikowski, J.; Kaczmarska, H.; Béguin, F.

    Boronated carbons from mesophase pitch have been used as materials for lithium storage in Li/carbon cells. Doping by boron has been realized by co-pyrolysis of coal tar pitch with the pyridine-borane complex. Amount of boron in mesocarbon microbeads (MCMB) varied from 1.4 to 1.8 wt.% affecting the texture of carbon. Optical microscopy and X-ray diffractograms have shown tendency to more disordered structure for boron-doped carbon. The values of specific reversible capacity ( x) varied from 0.7 to 1.1 depending significantly on the final temperature of pyrolysis (700-1150°C). The optimal charge/discharge performance was observed for boronated carbon heated at 1000°C.

  15. Electrochemical degradation of a real textile effluent using boron-doped diamond or {beta}-PbO{sub 2} as anode

    Energy Technology Data Exchange (ETDEWEB)

    Aquino, Jose M.; Pereira, Gabriel F. [Departmento de Quimica, Universidade Federal de Sao Carlos, C. P. 676, 13560-970 Sao Carlos, SP (Brazil); Rocha-Filho, Romeu C., E-mail: romeu@dq.ufscar.br [Departmento de Quimica, Universidade Federal de Sao Carlos, C. P. 676, 13560-970 Sao Carlos, SP (Brazil); Bocchi, Nerilso; Biaggio, Sonia R. [Departmento de Quimica, Universidade Federal de Sao Carlos, C. P. 676, 13560-970 Sao Carlos, SP (Brazil)

    2011-09-15

    Highlights: {center_dot} Diamond anode enables total abatement of a real textile effluent COD with low energy consumption. {center_dot} Use of diamond anode enables excellent decolorization rate of effluent in the presence of Cl{sup -} ions. {center_dot} Diamond anode might be an excellent option for electrochemical treatment of real textile effluents. {center_dot} PbO{sub 2} anode, due to low cost and easiness of preparation, may be an option to decolorize the effluents. - Abstract: Constant current electrolyses are carried out in a filter-press reactor using a boron-doped diamond (Nb/BDD) or a Ti-Pt/{beta}-PbO{sub 2} anode, varying current density (j) and temperature. The degradation of the real textile effluent is followed by its decolorization and chemical oxygen demand (COD) abatement. The effect of adding NaCl (1.5 g L{sup -1}) on the degradation of the effluent is also investigated. The Nb/BDD anode yields much higher decolorization (attaining the DFZ limit) and COD-abatement rates than the Ti-Pt/{beta}-PbO{sub 2} anode, at any experimental condition. The best conditions are j = 5 mA cm{sup -2} and 55 {sup o}C, for the system's optimized hydrodynamic conditions. The addition of chloride ions significantly increases the decolorization rate; thus a decrease of more than 90% of the effluent relative absorbance is attained using an applied electric charge per unit volume of the electrolyzed effluent (Q{sub ap}) of only about 2 kA h m{sup -3}. Practically total abatement of the effluent COD is attained with the Nb/BDD anode using a Q{sub ap} value of only 7 kA h m{sup -3}, with an energy consumption of about 30 kW h m{sup -3}. This result allows to conclude that the Nb/BDD electrode might be an excellent option for the remediation of textile effluents.

  16. Hydroxyl radical-related electrogenerated chemiluminescence reaction for a ruthenium tris(2,2')bipyridyl/co-reactants system at boron-doped diamond electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Honda, K. [Department of Chemistry and Earth Sciences, Faculty of Science Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan)]. E-mail: khonda@yamaguchi-u.ac.jp; Yamaguchi, Y. [Department of Chemistry and Earth Sciences, Faculty of Science Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan); Yamanaka, Y. [Department of Chemistry and Earth Sciences, Faculty of Science Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan); Yoshimatsu, M. [Department of Chemistry and Earth Sciences, Faculty of Science Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan); Fukuda, Y. [Department of Chemistry and Earth Sciences, Faculty of Science Yamaguchi University, 1677-1 Yoshida, Yamaguchi-shi, Yamaguchi 753-8512 (Japan); Fujishima, A. [Kanagawa Academy of Science and Technology (KAST), 3-2-1, Sakato, Takastu-ku, Kawasaki-shi, Kanagawa 213-0012 (Japan)

    2005-11-01

    An electrogenerated chemiluminescence (ECL) reaction of the Ru(bpy){sub 3} {sup 2+} (2,2'-bipyridyl, bpy)/co-reactant system in the extremely high-potential region (over 2.6 V versus Ag/AgCl) was probed using a boron-doped diamond (BDD) electrode. At the BDD electrode, three ECL waves (1.25, 2.30 and 3.72 V) were observed in cyclic voltammograms for 20 mM ascorbic acid (AA). For the ECL peaks observed at 1.25 V corresponding to the oxidation potential for Ru(bpy){sub 3} {sup 2+} (1.15 V), the light intensities and current densities were found to depend on the square root of the AA concentration. This suggests that AA oxidation, followed by the formation of the reducing radical that is necessary for generating the excited state of Ru(bpy){sub 3} {sup 2+*} occurred through homogeneous electron-transfer between Ru(bpy){sub 3} {sup 3+} and the AA species. However, for the ECL peaks at 2.30 V, the current densities and light intensities linearly increased with increasing AA concentration, suggesting that the reducing radical was formed through the direct oxidation at the electrode surface. The ECL reaction at 3.72 V was observed only at the BDD electrode and not at other electrodes. The onset potentials for the light intensity were approximately 2.6 V, independently of the type of the co-reactants (e.g. 2-propanol and AA). The peak potentials exhibited linear relation with the co-reactant concentration. In the analysis of the ECL intensity for various co-reactants (alcohols) that show different reactivity for the hydrogen abstraction reaction, the order of the light intensities at the peaks for alcohols was found to be consistent with that for the rate constants of the hydrogen abstraction reaction. These results indicate that the co-reactant radical was formed through the hydrogen abstraction reaction with the hydroxyl radical (HO{center_dot}) generated during the oxygen evolution reaction.

  17. Boron doped Si rich oxide/SiO{sub 2} and silicon rich nitride/SiN{sub x} bilayers on molybdenum-fused silica substrates for vertically structured Si quantum dot solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Ziyun, E-mail: z.lin@unsw.edu.au; Wu, Lingfeng; Jia, Xuguang; Zhang, Tian; Puthen-Veettil, Binesh; Yang, Terry Chien-Jen; Conibeer, Gavin; Perez-Wurfl, Ivan [School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Building H6, Tyree Energy Technologies Building, Kensington, New South Wales 2052 (Australia)

    2015-07-28

    Vertically structured Si quantum dots (QDs) solar cells with molybdenum (Mo) interlayer on quartz substrates would overcome current crowding effects found in mesa-structured cells. This study investigates the compatibility between boron (B) doped Si QDs bilayers and Mo-fused silica substrate. Both Si/SiO{sub 2} and Si/SiN{sub x} based QDs bilayers were studied. The material compatibility under high temperature treatment was assessed by examining Si crystallinity, microstress, thin film adhesion, and Mo oxidation. It was observed that the presence of Mo interlayer enhanced the Si QDs size confinement, crystalline fraction, and QDs size uniformity. The use of B doping was preferred compared to phosphine (PH{sub 3}) doping studied previously in terms of better surface and interface properties by reducing oxidized spots on the film. Though crack formation due to thermal mismatch after annealing remained, methods to overcome this problem were proposed in this paper. Schematic diagram to fabricate full vertical structured Si QDs solar cells was also suggested.

  18. Electroextraction of boron from boron carbide scrap

    Energy Technology Data Exchange (ETDEWEB)

    Jain, Ashish [Chemistry Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); Anthonysamy, S., E-mail: sas@igcar.gov.in [Chemistry Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); Ghosh, C. [Physical Metallurgy Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); Ravindran, T.R. [Materials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India); Divakar, R.; Mohandas, E. [Physical Metallurgy Group, Indira Gandhi Centre for Atomic Research, Kalpakkam – 603102 (India)

    2013-10-15

    Studies were carried out to extract elemental boron from boron carbide scrap. The physicochemical nature of boron obtained through this process was examined by characterizing its chemical purity, specific surface area, size distribution of particles and X-ray crystallite size. The microstructural characteristics of the extracted boron powder were analyzed by using scanning electron microscopy and transmission electron microscopy. Raman spectroscopic examination of boron powder was also carried out to determine its crystalline form. Oxygen and carbon were found to be the major impurities in boron. Boron powder of purity ∼ 92 wt. % could be produced by the electroextraction process developed in this study. Optimized method could be used for the recovery of enriched boron ({sup 10}B > 20 at. %) from boron carbide scrap generated during the production of boron carbide. - Highlights: • Recovery of {sup 10}B from nuclear grade boron carbide scrap • Development of process flow sheet • Physicochemical characterization of electroextracted boron • Microscopic examination of electroextracted boron.

  19. Polarization complex-plane plot of impedance for two-stage charge-transfer reaction complicated with an intermediate adsorption (by example of benzene oxidation at boron-doped diamond electrode)

    International Nuclear Information System (INIS)

    Polarization complex-plane plot of impedance for two-stage anodic reaction with partial charge transfer, complicated with an intermediate adsorption, is theoretically analyzed. The case of linear coverage dependence of the oxidation rate and linear potential dependence of the effective number of electrons involved in each stage, hence, quadratic potential dependence of the activation energies is considered. The result of the modeling agrees qualitatively with experimental data on benzene oxidation at boron-doped diamond electrode. The using of the partial charge transfer concept allowed revealing fine effects of the organics oxidation, which are ascribed to adsorption, in particular, emergence of a loop in the polarization complex-plane plot of impedance

  20. 不同浓度硼掺杂金刚石薄膜的场发射性能的研究%Enhanced Field Emission Characteristics of Boron Doped Diamond Films Grown by Microwave Plasma Assisted Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    石晓林

    2013-01-01

      利用微波等离子体化学气相淀积法(MPCVD),在硅基片上合成硼掺杂金刚石薄膜。研究B2O3从1000~5000 ppm不同浓度对场发射性能影响。随硼浓度地增加,纳米金刚石(NCD)薄膜的场发射性能得到改善。且场发射性能的增强归功于更好的电导率和金刚石薄膜的纳米特性。%s:Boron doped diamond films were synthesized on silicon substrates by MPCVD technique.The effect of B2O3concentration varied from 1000to5000ppm on the field emission characteristics was examined.The field emission properties of NCD films were observed to improve upon increasing boron concentration.The enhanced field emission properties are attributed to the better electrical conductivity coupled with the nanometric features of the diamond films.

  1. Boron-doped Graphene as Interlayer for Lithium-Sulfur Batteries%硼掺杂石墨烯用作锂硫电池夹层材料的研究

    Institute of Scientific and Technical Information of China (English)

    王璐

    2016-01-01

    Boron doped graphene (BGE) was fabricated from pyrolyzation of boric acid and reduced graphene oxide (rGO) and employed as the interlayer between sulfur cathode and separator. Research results were abtained that boron atom had been introduced into graphene skeleton, and improved the rate performance of~500 mAh/g capacity at 10C.%将硼酸和还原氧化石墨烯在高温下热解,制得硼掺杂石墨烯BGE,并用于硫正极和隔膜之间的夹层材料。形貌结构表征证明,硼原子被成功掺杂到石墨烯结构中。电化学测试表明,BGE夹层提高了电极导电性。得益于其对多硫化物的物理拦截和化学吸附功能特点,BGE夹层的采用提高了电池的倍率性能,取得了在10C下500 mAh·g-1的放电比容量。

  2. Crystallography, semiconductivity, thermoelectricity, and other properties of boron and its compounds, especially B6O

    Science.gov (United States)

    Slack, G. A.; Morgan, K. E.

    2015-09-01

    Electron deficient and non-deficient boron compounds are discussed as potential thermoelectric generator materials. Particular attention is paid to carbon-doped beta-boron, high-carbon boron carbide, and the alpha-boron derivative compound boron suboxide. Stoichiometric B6O shows some promise, and may have a higher ZT than the other two compounds. Carbon saturated beta-boron appears to have a higher ZT than undoped samples. Carbon saturated boron carbide at B12C3 does exist. Its thermoelectric behavior is unknown.

  3. Electrochemical detection of biapenem by a boron-doped diamond nanorod electrode%硼掺杂金刚石纳米棒电极对比阿培南的电化学检测研究

    Institute of Scientific and Technical Information of China (English)

    钟萍; 罗代兵; 任雁; 只金芳

    2011-01-01

    Biapenem is a new parenteral carbapenem that has antibacterial activity against a wide range of Gram-positive and -negative bacteria. Electroanalysis of biapenem and was made on a boron-doped diamond nanorod(BDDN ) electrode compared with a planar boron-doped diamond (BDD) electrode under the same conditions. The detection range of the BDDN electrode is wider and the sensitivity(0.038μ,A μM-1 )is higher than that of the BDD electrode(0.028μAμM-1 ). The BDDN electrode displays an amplified response than the flat BDD electrode. The BDDN electrode exhibits excellent electrochemical performance due to its higher e-lectro-active surface area and special nanostructures.%在自制的硅纳米线上采用热丝化学气相沉积方法制备了硼掺杂金刚石纳米棒电极.采用循环伏安及计时电流方法测定了在磷酸缓冲溶液中的药物比阿培南的浓度,灵敏度达到0.038μA μM-1较相同条件下制备得到的普通硼掺杂金刚石电极(0.028μA μM-1)相比有所提高.该纳米棒电极由于特殊的表面形貌,较普通硼掺杂金刚石电极表现出更优异的电化学检测性能.

  4. Ionization equilibrium at the transition from valence-band to acceptor-band migration of holes in boron-doped diamond

    Science.gov (United States)

    Poklonski, N. A.; Vyrko, S. A.; Poklonskaya, O. N.; Kovalev, A. I.; Zabrodskii, A. G.

    2016-06-01

    A quasi-classical model of ionization equilibrium in the p-type diamond between hydrogen-like acceptors (boron atoms which substitute carbon atoms in the crystal lattice) and holes in the valence band (v-band) is proposed. The model is applicable on the insulator side of the insulator-metal concentration phase transition (Mott transition) in p-Dia:B crystals. The densities of the spatial distributions of impurity atoms (acceptors and donors) and of holes in the crystal are considered to be Poissonian, and the fluctuations of their electrostatic potential energy are considered to be Gaussian. The model accounts for the decrease in thermal ionization energy of boron atoms with increasing concentration, as well as for electrostatic fluctuations due to the Coulomb interaction limited to two nearest point charges (impurity ions and holes). The mobility edge of holes in the v-band is assumed to be equal to the sum of the threshold energy for diffusion percolation and the exchange energy of the holes. On the basis of the virial theorem, the temperature Tj is determined, in the vicinity of which the dc band-like conductivity of holes in the v-band is approximately equal to the hopping conductivity of holes via the boron atoms. For compensation ratio (hydrogen-like donor to acceptor concentration ratio) K ≈ 0.15 and temperature Tj, the concentration of "free" holes in the v-band and their jumping (turbulent) drift mobility are calculated. Dependence of the differential energy of thermal ionization of boron atoms (at the temperature 3Tj/2) as a function of their concentration N is calculated. The estimates of the extrapolated into the temperature region close to Tj hopping drift mobility of holes hopping from the boron atoms in the charge states (0) to the boron atoms in the charge states (-1) are given. Calculations based on the model show good agreement with electrical conductivity and Hall effect measurements for p-type diamond with boron atom concentrations in the

  5. Effect of boron doping on the rectification effect and photovoltaic performance of CdS/Si heterostructure based on Si nanoporous pillar array

    International Nuclear Information System (INIS)

    A series of CdS/Si heterostructures were prepared through growing B-doped CdS thin films on silicon nanoporous pillar array (Si-NPA) by a chemical bath deposition (CBD) method. The experimental data show that B-doping concentration of CdS thin films could be tuned effectively through controlling the mole ratio of [B]/[Cd] of the initial CBD solution without causing obvious variation of the crystal phase and surface morphology of CdS/Si-NPA. Both the electrical rectification and photovoltaic parameters of CdS/Si-NPA show strong dependence upon B-doping concentration, and the optimal characteristics are achieved for the samples prepared with [B]/[Cd] = 0.01. Compared with CdS/Si-NPA solar cells without B-doping, an increment over 300 times for energy conversion efficiency is realized. The mechanism for the efficiency increment is analyzed based on the effect of B-doping on the band structure of CdS/Si-NPA. These results indicate that B-doping might be an effective path for promoting the device performance of solar cells based on CdS/Si-NPA. (paper)

  6. Microwave-Assisted Synthesis of Boron and Nitrogen co-doped Reduced Graphene Oxide for the Protection of Electromagnetic Radiation in Ku-Band.

    Science.gov (United States)

    Umrao, Sima; Gupta, Tejendra K; Kumar, Shiv; Singh, Vijay K; Sultania, Manish K; Jung, Jung Hwan; Oh, Il-Kwon; Srivastava, Anchal

    2015-09-01

    The electromagnetic interference (EMI) shielding of reduced graphene oxide (MRG), B-doped MRG (B-MRG), N-doped MRG (N-MRG), and B-N co-doped MRG (B-N-MRG) have been studied in the Ku-band frequency range (12.8-18 GHz). We have developed a green, fast, and cost-effective microwave assisted route for synthesis of doped MRG. B-N-MRG shows high electrical conductivity in comparison to MRG, B-MRG and N-MRG, which results better electromagnetic interference (EMI) shielding ability. The co-doping of B and N significantly enhances the electrical conductivity of MRG from 21.4 to 124.4 Sm(-1) because N introduces electrons and B provides holes in the system and may form a nanojunction inside the material. Their temperature-dependent electrical conductivity follows 2D-variable range hopping (2D-VRH) and Efros-Shklovskii-VRH (ES-VRH) conduction model in a low temperature range (Taircraft, defense industries, communication systems, and stealth technology. PMID:26287816

  7. 高温高压 Fe-Ni-C-B 系中含硼金刚石单晶合成机理研究(下)%Study of the Synthesis Mechanism of Boron-doped Diamond Monocrystal of HPHT Fe-Ni-C-B Series

    Institute of Scientific and Technical Information of China (English)

    李和胜; 李木森; 宫建红

    2015-01-01

    In order to research on the synthesis mechanism and growth mechanism of the boron-doped diamond, the boron-doped diamond monocrystal synthesised from the HPHT Fe-Ni-C-B Series and its surrounded metallic film have been systematically analysed through modern materials analysis technology.The result shows that the boron element added into the metal catalyzer has been dissolved into the surrounded metallic film as a metal-carbon-boron compound.Being as the direct carbon/boron source for the growth of the boron-doped diamond,it was catalysed by intermetallic phase and the acti-vated carbon/boron atoms were extracted and spreaded onto the surface of the growing di-amond monocrystal to promote the growth of the diamond.The boron-doped diamond grow in a layered growth model.The source for this type of growth during the early stage comes from two dimensional crystal nucleus and from dislocation during the late stage. The activated carbon/boron atoms spread onto the surface of the diamond monocrystal and are absorbed at the front end of the growth step and then transformed into part of the diamond monocrystal.As the step continues to expand,new growth step continues to de-velop on the newly grown crystal surface while the boron-doped diamond monocrystal grows in a layered stack-based pattern.%采用现代材料分析测试方法,通过对高温高压 Fe-Ni-C-B 系合成出的含硼金刚石单晶及其金属包覆膜进行系统分析和表征,探寻含硼金刚石合成机理及生长机制。研究发现,添加在金属触媒中的硼以金属-碳-硼化合物的形式溶入金属包覆膜,作为含硼金刚石生长的直接碳/硼源,经金属中间相的催化,析出活性碳/硼原子(团)扩散至正在生长的金刚石单晶表面,促进金刚石的生长。而含硼金刚石则以一种层状生长的方式长大,这种层状生长的台阶来源前期以二维晶核为主,后期则以位错为主。活性碳/硼原子(团)扩散到达金刚石

  8. 高温高压 Fe-Ni-C-B 系中含硼金刚石单晶合成机理研究(上)%Study of the Synthesis Mechanism of Boron-doped Diamond Monocrystal of HPHT Fe-Ni-C-B Series

    Institute of Scientific and Technical Information of China (English)

    李和胜; 李木森; 宫建红

    2014-01-01

    In order to research on the synthesis mechanism and growth mechanism of the boron-doped diamond, the boron-doped diamond monocrystal synthesised from the HPHT Fe-Ni-C-B Series and its surrounded metallic film have been systematically analysed through modern materials analysis technology.The result shows that the boron element added into the metal catalyzer has been dissolved into the surrounded metallic film as a metal-carbon-boron compound.Being as the direct carbon/boron source for the growth of the boron-doped diamond,it was catalysed by intermetallic phase and the acti-vated carbon/boron atoms were extracted and spreaded onto the surface of the growing di-amond monocrystal to promote the growth of the diamond.The boron-doped diamond grow in a layered growth model.The source for this type of growth during the early stage comes from two dimensional crystal nucleus and from dislocation during the late stage.The activated carbon/boron atoms spread onto the surface of the diamond monocrystal and are absorbed at the front end of the growth step and then transformed into part of the diamond monocrystal.As the step continues to expand,new growth step continues to de-velop on the newly grown crystal surface while the boron-doped diamond monocrystal grows in a layered stack-based pattern.%采用现代材料分析测试方法,通过对高温高压 Fe-Ni-C-B 系合成出的含硼金刚石单晶及其金属包覆膜进行系统分析和表征,探寻含硼金刚石合成机理及生长机制。研究发现,添加在金属触媒中的硼以金属-碳-硼化合物的形式溶入金属包覆膜,作为含硼金刚石生长的直接碳/硼源,经金属中间相的催化,析出活性碳/硼原子(团)扩散至正在生长的金刚石单晶表面,促进金刚石的生长。而含硼金刚石则以一种层状生长的方式长大,这种层状生长的台阶来源前期以二维晶核为主,后期则以位错为主。活性碳/硼原子(团)扩散到达金刚石

  9. BF3-doped polyaniline: A novel conducting polymer

    Indian Academy of Sciences (India)

    Debangshu Chaudhuri; D D Sarma

    2006-07-01

    We review the unusual structural, transport and magnetic properties of highly conducting polyaniline, doped with boron trifluoride. Our studies establish the unique conducting state of this system, which is in distinct contrast with the conventional proton-doped polyaniline samples.

  10. The thermal conductivity and thermal rectification in graphene nanoribbons with geometric variations of doped boron:A molecular dynamics study%不同硼掺杂几何形态下石墨烯纳米带热导率与热整流的分子动力学研究

    Institute of Scientific and Technical Information of China (English)

    黄希; 袁莉; 史经辉

    2014-01-01

    通过非平衡态分子动力学方法,研究了锯齿形石墨烯纳米带中掺杂原子硼的两种不同位置排列(三角形硼掺杂和平行硼掺杂)对热导率和热整流的影响并从理论上分析了其变化的原因。研究表明这两种硼掺杂模型在不同温度下导致石墨烯纳米带热导率大约54%-63%的下降;同时发现平行硼掺杂结构对热传递的抑制作用强于三角形硼掺杂结构;硼掺杂结构降低热导率的作用随着温度的升高逐渐减小;三角形硼掺杂结构两个方向上的热导率值具有较大差异,这种结构下的热整流随着温度的上升呈现减弱的趋势;而平行硼掺杂结构两个方向上的热导率值近乎相等,热整流现象表现不明显。%We investigated the thermal conductivity and thermal rectification of graphene nanoribbons with geo-metric variations by using classical molecular dynamics simulation, and analyzed theoretically the cause of the changes of thermal conductivity and thermal rectification.Two different structural models about boron-doped gra-phene nanoribbons were constructed by considering boron atomic arrangement:triangular single-boron-doped gra-phene nanoribbons, prarllel various-boron-doped graphene nanoribbons.It indicates that the thermal conductivi-ties of the above two different models are about 54%-63% lower than those of the pristine graphene nanorib-bons.And it was also found that the parallel boron-doped graphene nanoribbons are inhibited more strongly on the heat transfer than that of triangular boron-doped graphene nanoribbons.The reduction effect in the thermal conductivities of two different models gradually decreases with the increasing temperatures.The thermal conduc-tivities of triangular boron-doped graphene nanoribbons have a large difference in both directions, and the ther-mal rectification of this structure shows the downward trend with increasing temperature.However, the thermal conductivities

  11. Structural, electronic, and magnetic properties of boron cluster anions doped with aluminum:BnAlˉ (2 ≤ n ≤ 9)

    Institute of Scientific and Technical Information of China (English)

    Gu Jian-Bing; Yang Xiang-Dong; Wang Huai-Qian; Li Hui-Fang

    2012-01-01

    The geometrical structures,relative stabilities,electronic and magnetic properties of small BnAlˉ (2 ≤ n ≤ 9) clusters are systematically investigated by using the first-principles density functional theory.The results show that the Al atom prefers to reside either on the outer-side or above the surface,but not in the centre of the clusters in all of the most stable BnAlˉ (2 ≤ n ≤ 9) isomers and the one excess electron is strong enough to modify the geometries of some specific sizes of the neutral clusters.All the results of the analysis for the fragmentation energies,the second-order difference of energies,and the highest occupied-lowest unoccupied molecular orbital energy gaps show that B4Alˉ and B8Alˉ clusters each have a higher relative stability.Especially,the B8Alˉ cluster has the most enhanced chemical stability.Furthermore,both the local magnetic moments and the total magnetic moments display a pronounced oddeven oscillation with the number of boron atoms,and the magnetic effects arise mainly from the boron atoms except for the B7Alˉ and B9Alˉ clusters.

  12. Boron-Filled Hybrid Carbon Nanotubes.

    Science.gov (United States)

    Patel, Rajen B; Chou, Tsengming; Kanwal, Alokik; Apigo, David J; Lefebvre, Joseph; Owens, Frank; Iqbal, Zafar

    2016-01-01

    A unique nanoheterostructure, a boron-filled hybrid carbon nanotube (BHCNT), has been synthesized using a one-step chemical vapor deposition process. The BHCNTs can be considered to be a novel form of boron carbide consisting of boron doped, distorted multiwalled carbon nanotubes (MWCNTs) encapsulating boron nanowires. These MWCNTs were found to be insulating in spite of their graphitic layered outer structures. While conventional MWCNTs have great axial strength, they have weak radial compressive strength, and do not bond well to one another or to other materials. In contrast, BHCNTs are shown to be up to 31% stiffer and 233% stronger than conventional MWCNTs in radial compression and have excellent mechanical properties at elevated temperatures. The corrugated surface of BHCNTs enables them to bond easily to themselves and other materials, in contrast to carbon nanotubes (CNTs). BHCNTs can, therefore, be used to make nanocomposites, nanopaper sheets, and bundles that are stronger than those made with CNTs. PMID:27460526

  13. Boron-Filled Hybrid Carbon Nanotubes

    Science.gov (United States)

    Patel, Rajen B.; Chou, Tsengming; Kanwal, Alokik; Apigo, David J.; Lefebvre, Joseph; Owens, Frank; Iqbal, Zafar

    2016-07-01

    A unique nanoheterostructure, a boron-filled hybrid carbon nanotube (BHCNT), has been synthesized using a one-step chemical vapor deposition process. The BHCNTs can be considered to be a novel form of boron carbide consisting of boron doped, distorted multiwalled carbon nanotubes (MWCNTs) encapsulating boron nanowires. These MWCNTs were found to be insulating in spite of their graphitic layered outer structures. While conventional MWCNTs have great axial strength, they have weak radial compressive strength, and do not bond well to one another or to other materials. In contrast, BHCNTs are shown to be up to 31% stiffer and 233% stronger than conventional MWCNTs in radial compression and have excellent mechanical properties at elevated temperatures. The corrugated surface of BHCNTs enables them to bond easily to themselves and other materials, in contrast to carbon nanotubes (CNTs). BHCNTs can, therefore, be used to make nanocomposites, nanopaper sheets, and bundles that are stronger than those made with CNTs.

  14. Boron-Filled Hybrid Carbon Nanotubes

    Science.gov (United States)

    Patel, Rajen B.; Chou, Tsengming; Kanwal, Alokik; Apigo, David J.; Lefebvre, Joseph; Owens, Frank; Iqbal, Zafar

    2016-01-01

    A unique nanoheterostructure, a boron-filled hybrid carbon nanotube (BHCNT), has been synthesized using a one-step chemical vapor deposition process. The BHCNTs can be considered to be a novel form of boron carbide consisting of boron doped, distorted multiwalled carbon nanotubes (MWCNTs) encapsulating boron nanowires. These MWCNTs were found to be insulating in spite of their graphitic layered outer structures. While conventional MWCNTs have great axial strength, they have weak radial compressive strength, and do not bond well to one another or to other materials. In contrast, BHCNTs are shown to be up to 31% stiffer and 233% stronger than conventional MWCNTs in radial compression and have excellent mechanical properties at elevated temperatures. The corrugated surface of BHCNTs enables them to bond easily to themselves and other materials, in contrast to carbon nanotubes (CNTs). BHCNTs can, therefore, be used to make nanocomposites, nanopaper sheets, and bundles that are stronger than those made with CNTs. PMID:27460526

  15. Electrochemical oxidation of acid black 210 dye on the boron-doped diamond electrode in the presence of phosphate ions: Effect of current density, pH, and chloride ions

    International Nuclear Information System (INIS)

    The electrochemical oxidation of acid black 210 dye (AB-210) on the boron-doped diamond (BDD) was investigated under different pH conditions. The best performance for the AB-210 oxidation occurred in alkaline phosphate solution. This is probably due to oxidizing agents such as phosphate radicals and peroxodiphosphate ions, which can be electrochemically produced with good yields on the BDD anode, mainly in alkaline solution. Under this condition, the COD (chemical oxygen demand) removal was higher than that obtained from the model proposed by Comninellis. Electrolyses performed in phosphate buffer and in the presence of chloride ions resulted in faster COD and color removals in acid and neutral solutions, but in alkaline phosphate solution, a better performance in terms of TOC removal was obtained in the absence of chloride. Moreover, organochloride compounds were detected in all electrolyses performed in the presence of chloride. The AB-210 electrooxidation on BDD using phosphate as supporting electrolyte proved to be interesting since oxidizing species generated from phosphate ions were able to completely degrade the dye without producing organochloride compounds.

  16. Phenol removal from wastewaters by electrochemical oxidation using boron doped diamond (BDD) and Ti/Ti{sub 0.7}Ru{sub 0.3}O{sub 2} DSA Registered-Sign electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Britto-Costa, P.H.; Ruotolo, L.A.M., E-mail: pluis@ufscar.br [Universidade Federal de Sao Carlos (UFSCAR), SP (Brazil). Dept. de Engenharia Quimica

    2012-10-15

    Industrial wastewater containing non-biodegradable organic pollutants consists of highly toxic effluents whose treatment is necessary due to environmental and economical restrictions. In order to treat these effluents, an electrochemical process using a dimensionally stable anode (DSA Registered-Sign ) and boron-doped diamond (BDD) electrode was studied. The performance of these electrodes for COD removal from aqueous phenol solution was evaluated in the absence and presence of different chloride concentrations. The results showed that DSA Registered-Sign could be successfully used to remove COD when high chloride concentration (3035 mg L{sup -1}Cl{sup -}) and mild current density are employed (50 mA cm{sup -2}). On the other hand, the presence of chloride did not have the same significant effect on the COD depletion rate using BDD; however, under mild conditions (50 mA cm{sup -2}, 0.190 m s{sup -1}), the addition of 607 mg L{sup -1} Cl{sup -} improved the COD removal by approximately 52% after 8 hours of electrolysis. The effect of current density (i) and flow velocity (v) were also studied, and it was verified that they have an important role on the process performance, especially when DSA Registered-Sign is used. (author)

  17. Advanced microstructure of boron carbide.

    Science.gov (United States)

    Werheit, Helmut; Shalamberidze, Sulkhan

    2012-09-26

    The rhombohedral elementary cell of the complex boron carbide structure is composed of B(12) or B(11)C icosahedra and CBC, CBB or B□B (□, vacancy) linear arrangements, whose shares vary depending on the actual chemical compound. The evaluation of the IR phonon spectra of isotopically pure boron carbide yields the quantitative concentrations of these components within the homogeneity range. The structure formula of B(4.3)C at the carbon-rich limit of the homogeneity range is (B(11)C) (CBC)(0.91) (B□B)(0.09) (□, vacancy); and the actual structure formula of B(13)C(2) is (B(12))(0.5)(B(11)C)(0.5)(CBC)(0.65)(CBB)(0.16) (B□B)(0.19), and deviates fundamentally from (B(12))CBC, predicted by theory to be the energetically most favourable structure of boron carbide. In reality, it is the most distorted structure in the homogeneity range. The spectra of (nat)B(x)C make it evident that boron isotopes are not randomly distributed in the structure. However, doping with 2% silicon brings about a random distribution.

  18. Boron Nitride Nanotubes

    Science.gov (United States)

    Smith, Michael W. (Inventor); Jordan, Kevin (Inventor); Park, Cheol (Inventor)

    2012-01-01

    Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

  19. Room-Temperature Near-Infrared Electroluminescence from Boron-Diffused Silicon Pn-Junction Diodes

    OpenAIRE

    Li, Si; Gao, Yuhan; Fan, Ruixin; Li, Dongsheng; Yang, Deren

    2015-01-01

    Silicon pn-junction diodes with different doping concentrations were prepared by boron diffusion into Czochralski n-type silicon substrate. Their room-temperature near-infrared electroluminescence (EL) was measured. In the EL spectra of the heavily boron doped diode, a luminescence peak at ~1.6 μm (0.78 eV) was observed besides the band-to-band line (~1.1 eV) under the condition of high current injection, while in that of the lightly boron doped diode only the band-to-band line was observed. ...

  20. Room-temperature near-infrared electroluminescence from boron-diffused silicon pn junction diodes

    OpenAIRE

    Si eLi; Yuhan eGao; Ruixin eFan; Dongsheng eLi; Deren eYang

    2015-01-01

    Silicon pn junction diodes with different doping concentrations were prepared by boron diffusion into Czochralski (CZ) n-type silicon substrate. Their room-temperature near-infrared electroluminescence (EL) was measured. In the EL spectra of the heavily boron doped diode, a luminescence peak at ~1.6 m (0.78 eV ) was observed besides the band-to-band line (~1.1eV) under the condition of high current injection, while in that of the lightly boron doped diode only the band-to-band line was obser...

  1. Charge distributions and electronic properties of boron and nitrogen-doped graphene%硼氮双原子掺杂石墨烯电荷分布和电子特性的研究

    Institute of Scientific and Technical Information of China (English)

    杨忠志; 李帅; 朱怡静; 刘爽

    2015-01-01

    The zigzag‐edge graphene doped with boron(B) and nitrogen(N) atoms is used as the mod‐el ,it should be optimized by B3LYP/6‐31G(d ,p) method .We define the ABEEMσπ labels of its at‐oms and bonds .After the ABEEMσπparameters are determined ,the charges calculated by ABEEMσπmethod are compared with those obtained by HF/STO‐3G method .The results show that they are consistent .Through the frontier molecular orbital theory ,the HOMO and LUMO are analyzed .The results show that electrons participate in conducting of the graphene are mainly distributed in the up‐per and lower edges .The HOMO and LUMO of graphene remain unchange after doping with B and N atoms ,the conductivity is unaffected .The DOS fig shows that there is an effect on DOS after doping with B and N atoms ,but the DOS of HOMO and LUMO are not changed .The position of Fermi level is unchanged ,so it does not change the energy gap of graphene .By comparing the DOS of graphene ,it can be more intuitive to reflect that the conductivity is unaffected after doping with B and N atoms .%以内部掺杂1对硼氮原子的单层锯齿形边缘石墨烯为模型,利用密度泛函理论B3LYP/6‐31G(d ,p)方法优化模型的结构。定义硼氮双原子掺杂石墨烯体系中各位点的ABEEMσπ标号,以HF/STO‐3G方法计算的体系电荷为标准,拟合并确定所定义标号的ABEEMσπ参数。应用其计算硼氮双原子掺杂石墨烯的电荷分布并与从头算计算结果作对比,结果显示用ABEEMσπ方法算出的电荷与从头算方法算出的电荷具有很好的一致性。使用前线分子轨道理论分析其最高占据轨道(HOMO)和最低空轨道(LU‐MO),且比较能隙值的变化。可以得出,石墨烯中参与导电的电子主要分布在上下锯齿形边缘,内部掺杂1对硼氮原子后,它的HOMO和LUMO基本不变,不影响其导电性。态密度图显示了掺杂1对硼氮原子后,虽然在部分能量范

  2. Interaction of boron with graphite: A van der Waals density functional study

    Science.gov (United States)

    Liu, Juan; Wang, Chen; Liang, Tongxiang; Lai, Wensheng

    2016-08-01

    Boron doping has been widely investigated to improve oxidation resistance of graphite. In this work the interaction of boron with graphite is investigated by a van der Waals density-functional approach (vdW-DF). The traditional density-functional theory (DFT) is well accounted for the binding in boron-substituted graphite. However, to investigate the boron atom on graphite surface and the interstitial impurities require use of a description of graphite interlayer binding. Traditional DFT cannot describe the vdW physics, for instance, GGA calculations show no relevant binding between graphite sheets. LDA shows some binding, but they fail to provide an accurate account of vdW forces. In this paper, we compare the calculation results of graphite lattice constant and cohesive energy by several functionals, it shows that vdW-DF such as two optimized functionals optB88-vdW and optB86b-vdW give much improved results than traditional DFT. The vdW-DF approach is then applied to study the interaction of boron with graphite. Boron adsorption, substitution, and intercalation are discussed in terms of structural parameters and electronic structures. When adsorbing on graphite surface, boron behaves as π electron acceptor. The π electron approaches boron atom because of more electropositive of boron than carbon. For substitution situation, the hole introduced by boron mainly concentrates on boron and the nearest three carbon atoms. The B-doped graphite system with the hole has less ability to offer electrons to oxygen, ultimately resulted in the inhibition of carbon oxidation. For interstitial doping, vdW-DFs show more accurate formation energy than LDA. PBE functional cannot describe the interstitial boron in graphite reasonably because of the ignoring binding of graphite sheets. The investigation of electron structures of boron doped graphite will play an important role in understanding the oxidation mechanism in further study.

  3. Effect of thermal annealing on the optical and electrical properties of boron doped a-SiOx:H for thin-film silicon solar cell applications

    International Nuclear Information System (INIS)

    The p-type layer in a p-i-n thin-film solar cell plays a crucial role in determining efficiency. The requirements for p-type layer films are high optical band gap (Eg), narrow valence band tail to minimize optical absorption, high dark conductivity, and low activation energy to reduce the parasitic series resistance of the solar cell. We investigated the effects of temperature during film growth and post-deposition thermal annealing on the optical and electronic properties of p-type amorphous silicon oxide films (p-a-SiOx:H) for thin-film silicon solar cell applications. The activation energy of thermally annealed p-a-SiOx:H film prepared at low substrate temperature decreased from 0.72 eV to 0.56 eV with similar Eg. Our improvements are explained in the changed ratio of conjugation with the three- and four-fold coordinated boron atoms by the shift of the B (1 s) X-ray photoelectron spectrum. Taking into account the reversible electrical change by thermal annealing while maintaining high optical properties, we propose necessary process-procedure conditions for obtaining high photovoltaic performance in thin-film-Si solar cells with high-quality p-a-SiOx:H. We carried out device modeling of p-i-n junction amorphous silicon solar cells by employing a thermal annealing effect on p-type a-SiOx:H layer, using an advanced semiconductor analysis simulator. Due to reduced Ea with high Eg of p-type a-SiOx:H layer after thermal annealing, the solar cell performance of the open circuit voltage, fill factor, and conversion efficiency improved by 11.1%, 60.42%, and 53.75%, respectively. - Highlights: • We investigated the effects thermal annealing on p-a-SiOx:H films. • The Ea property of annealed p-a-SiOx:H film prepared at low temperature decreased. • The simulated performance of solar cell with annealed p-type a-SiOx:H improved

  4. Efficiency and stability of spectral sensitization of boron-doped-diamond electrodes through covalent anchoring of a donor-acceptor organic chromophore (P1).

    Science.gov (United States)

    Krysova, Hana; Barton, Jan; Petrak, Vaclav; Jurok, Radek; Kuchar, Martin; Cigler, Petr; Kavan, Ladislav

    2016-06-28

    A novel procedure is developed for chemical modification of H-terminated B-doped diamond surfaces with a donor-π-bridge-acceptor molecule (P1). A cathodic photocurrent near 1 μA cm(-2) flows under 1 Sun (AM 1.5) illumination at the interface between the diamond electrode and aqueous electrolyte solution containing dimethylviologen (electron mediator). The efficiency of this new electrode outperforms that of the non-covalently modified diamond with the same dye. The found external quantum efficiency of the P1-sensitized diamond is not far from that of the flat titania electrode sensitized by a standard organometallic dye used in solar cells. However, the P1 dye, both pure and diamond-anchored, shows significant instability during illumination by solar light. The degradation is a two-stage process in which the initially photo-generated products further decompose in complicated dark reactions. These findings need to be taken into account for optimization of organic chromophores for solar cells in general. PMID:27264474

  5. Thermoelectric properties of β-boron and some boron compounds. Final report, August 1981-September 1984

    International Nuclear Information System (INIS)

    The thermoelectric properties, that is the Seebeck coefficient, and electrical and thermal conductivity, of doped β-boron have been measured from 300 to 1600 K. Most of the useful doping elements are transition metals and occupy interstitial sites in the lattice. The highest figure of merit so far achieved at 1000 K is ZT = 0.11 for P-type, polycrystalline, hot-pressed β-boron doped with copper. Higher values may be achievable once a better P-type dopant is found. Some experiments on B68Y, α-B12Al, B4C, and B6Si are described. Transition metals appear to be effective dopants for B68Y and B4C

  6. Lateral boron distribution in polycrystalline SiC source materials

    DEFF Research Database (Denmark)

    Linnarsson, M. K.; Kaiser, M.; Liljedahl, R.;

    2013-01-01

    . The materials are co-doped materials with nitrogen and boron to a concentration of 1x1018 cm-3 and 1x1019 cm-3, respectively. Depth profiles as well as ion images have been recorded. According to ocular inspection, the analyzed poly-SiC consists mainly of 4H-SiC and 6H-SiC grains. In these grains, the boron...

  7. Influence of boron concentration on nonlinear absorption and ultrafast dynamics in GaSe crystals

    Science.gov (United States)

    Karatay, Ahmet; Yuksek, Mustafa; Ertap, Hüseyin; Mak, Ali Kemal; Karabulut, Mevlüt; Elmali, Ayhan

    2016-10-01

    The nonlinear absorption properties and ultrafast dynamics of pure and boron doped GaSe crystals have been studied by open aperture Z-scan and ultrafast pump probe spectroscopy techniques. All of the studied crystals showed nonlinear absorption under 100 fs pulse duration and 1200 nm wavelength excitations. Nonlinear absorption coefficients increase with increasing the doping ratio of boron atoms in crystals. These findings indicate that free carrier density increase with boron doping and this behavior leads to excited state absorption. Second harmonic generation signals of crystals were detected with the help of fiber optic spectrometer. The blue shift in the energy of the second harmonic generation signals was observed in boron doped crystals. Ultrafast pump probe experiments indicate that the excited state absorption signal with long lifetime observed for undoped GaSe crystal switches to bleach signal for boron doped GaSe crystals at 625 nm probe wavelength. The effects of increasing doping ratio were observed on ultrafast dynamics as a switching time changes. Our experimental results indicate that it is possible to control nonlinear absorption properties, frequency conversion and ultrafast dynamics of GaSe crystal by changing boron doping ratio.

  8. Boron induced charge traps near the interface of Si/SiO{sub 2} probed by second harmonic generation

    Energy Technology Data Exchange (ETDEWEB)

    Park, Heungman; Varga, Kalman; Tolk, Norman [Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235 (United States); Qi, Jingbo [Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235 (United States); National High Magnetic Field Laboratory, Tallahassee, Florida 32310 (United States); Xu, Ying [Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235 (United States); Zomega Terahertz Corporation, Troy, New York 12180 (United States); Weiss, Sharon M. [Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235 (United States); Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, Tennessee 37235 (United States); Rogers, Bridget R. [Department of Chemical and Biomolecular Engineering, Nashville, Vanderbilt University, Tennessee 37235 (United States); Luepke, Gunter [Department of Applied Science, College of William and Mary, Williamsburg, Virginia 23187 (United States)

    2010-08-15

    We review recent second harmonic generation (SHG) measurements for highly boron-doped Si/SiO{sub 2} systems. Using electric field sensitive time-dependent SHG (TD-SHG), we determined that the direction of the initial DC electric field at the interface induced by boron induced charge traps is from oxide to silicon thus demonstrating that the boron induced charge traps in the oxide are positively charged. For a thin oxide ({proportional_to}2 nm) both boron traps and O{sub 2} surface oxide traps contribute. However, for a highly boron-doped Si/SiO{sub 2} sample with a thick thermally grown oxide (thickness: 12 nm), the TD-SHG signal exhibits a monotonic decrease arising from filling only the boron charge traps. By fitting our data, we show that the interface effective susceptibility vertical stroke {chi}{sup (2)} vertical stroke is heavily dependent on doping concentration. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  9. Nuclear characterizations and applications of boron-containing materials

    International Nuclear Information System (INIS)

    Materials either doped with traces of boron or containing this element as a matrix component have important technological and research applications. For most applications in technology, semiconductor doping, chemical vapor deposition of glass films, and optical waveguide fiber manufacture, boron levels or distribution must be controlled precisely. Thus, methods for quantitation of boron are needed, and its analytical chemistry still receives considerable study. Several nondestructive nuclear methods are described in this paper that have unique capabilities for quantitative analyses of boron at the trace and macro levels. Excellent high-sensitivity determinations are based on alpha track counting. For micro- and macroanalyses, the nuclear track technique using the 10B(n,α)7 Li reaction has been applied to map qualitatively the distribution of boron in borosilicate glass and in optical waveguide glass and fibers. Boron in the 1.59 to 7.75% range is determinable in silicate glasses. Similar information has also been obtained by prompt gamma neutron activation. Neuron depth profiling of boron in glass has been performed also. Results for several of these methods are reported

  10. Boron effects on the ductility of a nano-cluster-strengthened ferritic steel

    International Nuclear Information System (INIS)

    Research highlights: → Cu-rich nano-particle precipitation strengthens the ferritic steels. → Boron doping suppresses brittle intergranular fracture. → Moisture-induced environmental embrittlement can be alleviated by surface coating. - Abstract: The mechanical properties of Cu-rich nano-cluster-strengthened ferritic steels with and without boron doping were investigated. Tensile tests at room temperature in air showed that the B-doped ferritic steel has similar yield strength but a larger elongation than that without boron doping after extended aging at 500 deg. C. There are three mechanisms affecting the ductility and fracture of these steels: brittle cleavage fracture, week grain boundaries, and moisture-induced hydrogen embrittlement. Our study reveals that boron strengthens the grain boundary and suppresses the intergranular fracture. Furthermore, the moisture-induced embrittlement can be alleviated by surface coating with vacuum oil.

  11. Experimental Study Of The Boron Redistribution In Two Series Of Bilayer Films Silicon-Based

    OpenAIRE

    SACI, Lynda; MAHAMDI, Ramdane; MANSOUR, Farida; TEMPLE-BOYER, Pierre

    2011-01-01

    The present work focuses on the study two sets of films bilayers obtained by Low Pressure Chemical Vapor Deposition (LPCVD), for use as material to MOS gate structures (transistors, chemical sensor ISFET, etc.). The first series of films are composed by two layers, silicon amorphous un-doped layer (poly1) and polysilicon boron doped in situ (poly2). The second series are constituted by boron doped polysilicon (polySi) and nitrogen doped polysilicon (NIDOS). These films (poly1/poly2/SiO2 and p...

  12. Boron nitride converted carbon fiber

    Energy Technology Data Exchange (ETDEWEB)

    Rousseas, Michael; Mickelson, William; Zettl, Alexander K.

    2016-04-05

    This disclosure provides systems, methods, and apparatus related to boron nitride converted carbon fiber. In one aspect, a method may include the operations of providing boron oxide and carbon fiber, heating the boron oxide to melt the boron oxide and heating the carbon fiber, mixing a nitrogen-containing gas with boron oxide vapor from molten boron oxide, and converting at least a portion of the carbon fiber to boron nitride.

  13. Electro-Fenton, UVA photoelectro-Fenton and solar photoelectro-Fenton degradation of the drug ibuprofen in acid aqueous medium using platinum and boron-doped diamond anodes

    Energy Technology Data Exchange (ETDEWEB)

    Skoumal, Marcel; Rodriguez, Rosa Maria; Cabot, Pere Lluis; Centellas, Francesc; Garrido, Jose Antonio; Arias, Conchita [Laboratori d' Electroquimica dels Materials i del Medi Ambient, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain); Brillas, Enric [Laboratori d' Electroquimica dels Materials i del Medi Ambient, Departament de Quimica Fisica, Facultat de Quimica, Universitat de Barcelona, Marti i Franques 1-11, 08028 Barcelona (Spain)], E-mail: brillas@ub.edu

    2009-02-28

    The degradation of a 41 mg dm{sup -3} ibuprofen (2-(4-isobutylphenyl)propionic acid) solution of pH 3.0 has been comparatively studied by electrochemical advanced oxidation processes (EAOPs) like electro-Fenton, UVA photoelectro-Fenton and solar photoelectro-Fenton at constant current density. Experiments were performed in a one-compartment cell with a Pt or boron-doped diamond (BDD) anode and an O{sub 2}-diffusion cathode. Heterogeneous hydroxyl radical ({center_dot}OH) is generated at the anode surface from water oxidation, while homogeneous {center_dot}OH is formed from Fenton's reaction between Fe{sup 2+} and H{sub 2}O{sub 2} generated at the cathode, being its production strongly enhanced from photo-Fenton reaction induced by sunlight. Higher mineralization is attained in all methods using BDD instead Pt, because the former produces greater quantity of {center_dot}OH enhancing the oxidation of pollutants. The mineralization rate increases under UVA and solar irradiation by the rapid photodecomposition of complexes of Fe(III) with acidic intermediates. The most potent method is solar photoelectro-Fenton with BDD giving 92% mineralization due to the formation of a small proportion of highly persistent final by-products. The effect of Fe{sup 2+} content, pH and current density on photoelectro-Fenton degradation has been studied. The ibuprofen decay always follows a pseudo-first-order kinetics and its destruction rate is limited by current density and UV intensity. Aromatics such as 1-(1-hydroxyethyl)-4-isobutylbenzene, 4-isobutylacetophenone, 4-isobutylphenol and 4-ethylbenzaldehyde, and carboxylic acids such as pyruvic, acetic, formic and oxalic have been identified as oxidation by-products. Oxalic acid is the ultimate by-product and the fast photodecarboxylation of its complexes with Fe(III) under UVA or solar irradiation explains the higher oxidation power of photoelectro-Fenton methods in comparison to electro-Fenton procedures.

  14. 因子设计法优化掺硼金刚石电催化降解染料废水%Electrocatalytic degradation of dye wastewater on boron-doped diamond using factorial design methodology

    Institute of Scientific and Technical Information of China (English)

    杨丽姣; 周慧芬; 张春永

    2012-01-01

    掺硼金刚石电催化工艺(BDD工艺)作为当前热门的水处理技术,已被成功用于降解多种有机污染物。采用因子设计方法,考查了BDD工艺对偶氮染料金橙-Ⅱ的降解效能。实验选用染料初始浓度、反应时间、电解质浓度、施加电流和流速作为操作参数,并以脱色率作为响应指标来评估各参数的统计学显著性。在考察的5个因素中,前两者对于处理效果具有最为显著的影响。为此,在高因子水平情况下又进一步分析了它们的主效应和相互效应,同时构造了回归模型。实验结果表明,因子设计法对于优化BDD工艺是非常适用的,并显示了其实际应用的前景。%As an attractive technique of water treatment,the electrocatalytic technology concerning boron-doped diamond(BDD) technology has been successfully applied to the degradation of various organic pollutants.The removal efficiency of an azonic dye(Orange-Ⅱ) was investigated using BDD technology.A factorial design methodology was implemented to evaluate the statistically important operating parameters,among initial dye concentration,treatment time,electrolyte concentration,applied current and flow rate,on treatment efficiency;the latter was assessed in terms of color removal rate.Of the five parameters tested,the first two had a considerable effect on the treatment performance.Hence,analysis was repeated under more intense conditions to study their main and interaction effects,as well as to construct a regression model.As a result,the factorial design methodology was proved to be very suitable in optimizing the BDD technology,thus showing great promise for real applications.

  15. Mineralization of phthalic acid by solar photoelectro-Fenton with a stirred boron-doped diamond/air-diffusion tank reactor: Influence of Fe3+ and Cu2+ catalysts and identification of oxidation products

    International Nuclear Information System (INIS)

    Highlights: • Almost total mineralization of phthalic acid by solar photoelectro-Fenton with Fe3+, Cu2+ and Fe3+–Cu2+ mixtures. • Hydroxyl radical generation from photo-Fenton reaction under solar radiation. • Enhancement of the mineralization rate using Fe3+ and small amounts of Cu2+. • Detection of eleven aromatic intermediates and six short-linear carboxylic acids. • Oxidation of Cu(II)-carboxylate complexes with ·OH and photolysis of Fe(III)-carboxylate species. -- Abstract: Here, the substrate decay and mineralization rate for 100 cm3 of a 2.0 mM phthalic acid solution in 0.10 M Na2SO4 of pH 3.0 have been studied by electro-Fenton (EF) and solar photoelectro-Fenton (SPEF). The electrochemical cell was a stirred tank reactor containing a 3 cm2 boron-doped diamond (BDD) anode and a 3 cm2 air-diffusion cathode that generates H2O2. Cu2+ and/or Fe3+ were added as catalysts with total concentration of 0.50 mM and a constant current density of 33.3 mA cm−2 was applied. In EF with Cu2+ or Fe3+ alone and SPEF with only Cu2+, phthalic acid decayed slowly and poor mineralization was reached because the main oxidant was ·OH produced at the BDD surface from water oxidation. In contrast, the substrate destruction was largely enhanced using SPEF with 0.50 mM Fe3+ since a high quantity of oxidant ·OH was produced in the bulk induced by photo-Fenton reaction. This treatment led to an almost total mineralization by the photolysis of generated Fe(III)-carboxylate complexes. In all cases, the decay of phthalic acid obeyed a pseudo-first-order reaction. The combination of Cu2+ and Fe3+ as catalysts accelerated the mineralization process in SPEF because Cu(II)-carboxylate complexes were also removed with ·OH formed from photo-Fenton reaction. The best SPEF process was found for 0.125 mM Cu2+ + 0.375 mM Fe3+, giving rise to 99% mineralization with 40% current efficiency and 0.294 kWh g−1 TOC energy consumption. Eleven aromatics and six short-linear carboxylic

  16. 用于航天器冷凝水处理的硼掺杂金刚石电极的制备及应用%Fabrication and Application of Boron Doped Diamond Electrodes in Condensate Water Purification in Spacecraft

    Institute of Scientific and Technical Information of China (English)

    李浩; 杨彬; 李中坚; 王传增; 韩松; 雷乐成

    2013-01-01

    Objective To effectively apply boron doped diamond (BDD) electrodes through electrochemical catalytic oxidation technology in the treatment of condensate water in spacecraft.Methods The authors manufactured a large area,equally distributed BDD electrode deposited on the Nb substrate by hot filament chemical vapor deposition (HFCVD).Then it was used to process simulated condensate water.Results Simulated condensate water 200 mL was processed with the current density of 10,13,15 mA/cm2.When the percentage of TOC removal was 80%,the required time were 150,120,100 min,and power consumption were 7.48,11.4,14.59 W,respectively.After treatment,all the alcohol type of materials in condensate water were oxidzed and no obvious delamination of the film was observed.Conclusion Compared with the PbO2 electrode and the Nb/BDD electrode,the BDD electrode has remarkable advantages in stability and treatment efficiency.%目的 通过电化学催化氧化技术,将硼掺杂金刚石(BDD)电极高效应用于航天器冷凝水的处理工作中.方法 采用热丝化学气相沉积(HFCVD)技术在铌板上制备得到了大面积、均匀分布的BDD电极,并将制得的BDD电极用于降解模拟冷凝水实验.结果 模拟冷凝水处理量为200 mL,在电流密度为10,13,15 mA/cm2条件下,达到80% TOC去除率分别需要150,120,100 min,功耗为7.48,11.4,14.59W;对处理后的冷凝水成分分析发现,冷凝水中原有的醇类物质被完全氧化;而且电极在连续运行之后也并未发现明显的剥落现象.结论 制得的BDD电极与二氧化铅电极相比,无论是在稳定性还是处理效率方面,都具有显著的优势.

  17. Raman spectroscopic characterization of the core-rim structure in reaction bonded boron carbide ceramics

    Energy Technology Data Exchange (ETDEWEB)

    Jannotti, Phillip; Subhash, Ghatu, E-mail: subhash@ufl.edu [Department of Mechanical and Aerospace Engineering, University of Florida, Gainesville, Florida 32611 (United States); Zheng, James Q.; Halls, Virginia [Program Executive Office—Soldier Protection and Individual Equipment, US Army, Fort Belvoir, Virginia 22060 (United States); Karandikar, Prashant G.; Salamone, S.; Aghajanian, Michael K. [M-Cubed Technologies, Inc., Newark, Delaware 19711 (United States)

    2015-01-26

    Raman spectroscopy was used to characterize the microstructure of reaction bonded boron carbide ceramics. Compositional and structural gradation in the silicon-doped boron carbide phase (rim), which develops around the parent boron carbide region (core) due to the reaction between silicon and boron carbide, was evaluated using changes in Raman peak position and intensity. Peak shifting and intensity variation from the core to the rim region was attributed to changes in the boron carbide crystal structure based on experimental Raman observations and ab initio calculations reported in literature. The results were consistent with compositional analysis determined by energy dispersive spectroscopy. The Raman analysis revealed the substitution of silicon atoms first into the linear 3-atom chain, and then into icosahedral units of the boron carbide structure. Thus, micro-Raman spectroscopy provided a non-destructive means of identifying the preferential positions of Si atoms in the boron carbide lattice.

  18. Reduced Antivation Ferritic/Martensitic Steel Eurofer 97 as Possible Structural Material for Fusion Devices. Metallurgical Characterization on As-Received Condition and after Simulated Services Conditions

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez, P.; Lancha, A. M.; Lapena, J.; Serrano, M.; Hernandez-Mayoral, M.

    2004-07-01

    Metallurgical Characterization of the reduced activation ferritic/martensitic steel Eurofer'97, on as-received condition and after thermal ageing treatment in the temperature range from 400 degree centigree to 600 degree centigree for periods up to 10.000 h, was carried out. The microstructure of the steel remained stable (tempered martensite with M{sub 2}3 C{sub 6} and MX precipitates) after the thermal ageing treatments studied in this work. In general, this stability was also observed in the mechanical properties. The Eurofer'97 steel exhibited similar values of hardness, ultimate tensile stress, 0,2% proof stress, USE and T{sub 0}3 regardless of the investigated material condition. However, ageing at 600 degree centigree for 10.000 ha caused a slight increase in the DBTT, of approximately 23. In terms of creep properties, the steel shows in general adequate creep rupture strength levels for short rupture times. However, the results obtained up to now for long time creep rupture tests at 500 degree centigree suggests a change in the deformation mechanisms. (Author) 62 refs.

  19. Influence of structure defects on optical and electronic properties of icosahedral boron rich solids

    CERN Document Server

    Schmechel, R

    1999-01-01

    doped beta-rhombohedral boron by Kramers-Kronig-Analysis gives information on the main transport processes. Beside hopping conduction of localized electrons, band conduction of delocalized electrons were found. While holes in the valence band are the delocalized charge carriers in boron carbide, in vanadium doped beta-rhombohedral boron delocalized electrons in an extrinsic impurity band are suggested. Boron and boron rich solids are known to have a high concentration on intrinsic structural imperfections. From known structure data of real crystals and known band structure calculations of perfect ideal crystals a correlation between intrinsic structure defect concentration and electron deficit in the valence band is concluded. This correlation forms the basis for the following theses: 1. The electron deficit in the valence band of a perfect crystal is the driving force for the intrinsic structure defects in a real crystal. 2. The small electron deficit becomes compensated by the structure defects - this expla...

  20. Recent Advances in Boron-Containing Conjugated Porous Polymers

    Directory of Open Access Journals (Sweden)

    Feng Qiu

    2016-05-01

    Full Text Available Porous polymers, integrating the advantages of porous materials and conventional polymers, have been well developed and exhibited tremendous attention in the fields of material, chemistry and biology. Of these, boron-containing conjugated porous polymers, featuring tunable geometric structures, unique Lewis acid boron centers and very rich physical properties, such as high specific surface, chargeable scaffold, strong photoluminescence and intramolecular charge transfer, have emerged as one of the most promising functional materials for optoelectronics, catalysis and sensing, etc. Furthermore, upon thermal treatment, some of them can be effectively converted to boron-doped porous carbon materials with good electrochemical performance in energy storage and conversion, extensively enlarging the applicable scope of such kinds of polymers. In this review, the synthetic approaches, structure analyses and various applications of the boron-containing conjugated porous polymers reported very recently are summarized.

  1. Chemical nature of boron and nitrogen dopant atoms in graphene strongly influences its electronic properties.

    Science.gov (United States)

    Lazar, Petr; Zbořil, Radek; Pumera, Martin; Otyepka, Michal

    2014-07-21

    Boron and nitrogen doped graphenes are highly promising materials for electrochemical applications, such as energy storage, generation and sensing. The doped graphenes can be prepared by a broad variety of chemical approaches. The substitution of a carbon atom should induce n-type behavior in the case of nitrogen and p-type behavior in the case of boron-doped graphene; however, the real situation is more complex. The electrochemical experiments show that boron-doped graphene prepared by hydroboration reaction exhibits similar properties as the nitrogen doped graphene; according to theory, the electrochemical behavior of B and N doped graphenes should be opposite. Here we analyze the electronic structure of N/B-doped graphene (at ∼5% coverage) by theoretical calculations. We consider graphene doped by both substitution and addition reactions. The density of states (DOS) plots show that graphene doped by substitution of the carbon atom by N/B behaves as expected, i.e., as an n/p-doped material. N-doped graphene also has a lower value of the workfunction (3.10 eV) with respect to that of the pristine graphene (4.31 eV), whereas the workfunction of B-doped graphene is increased to the value of 5.57 eV. On the other hand, the workfunctions of graphene doped by addition of -NH2 (4.77 eV) and -BH2 (4.54 eV) groups are both slightly increased and therefore the chemical nature of the dopant is less distinguishable. This shows that mode of doping depends significantly on the synthesis method used, as it leads to different types of behaviour, and, in turn, different electronic and electrochemical properties of doped graphene, as observed in electrocatalytic experiments. This study has a tremendous impact on the design of doped graphene systems from the point of view of synthetic chemistry.

  2. Study of boron effect on FeAl alloys with an ordered B2 structure

    International Nuclear Information System (INIS)

    FeAl alloys with an ordered B2 structure have good corrosion resistance and mechanical properties at high temperature. Nevertheless, their use is limited by the intergranular embrittlement at ambient temperature. It has already been shown that a doping by low amounts of boron can solve the problem of intergranular embrittlement. The aim of this work is to better understand the boron effect on the FeAl alloys. It has been confirmed that the boron doping change the mode of rupture of the FeAl alloys with a B2 structure; their strain on breaking point is increased. The limit of solubility of boron in Fe-40Al has been estimated between 400 and 800 ppm at 500 degrees Celsius. Above this limit, Fe2B precipitates. The intergranular segregation of boron has been observed by Auger electron spectroscopy for all the FeAl alloys. The intergranular amount of boron is low (below 12%). In the range of boron solubility, the intergranular concentration of boron increases with its voluminal amount. From this result, boron segregation has been described by different models of equilibrium segregation; thus has been shown that it exists a strong repulsion energy between the segregated boron atoms. On the other hand, no equilibrium segregation model can describe the independence to temperature of the boron segregation and its very fast kinetics: these two characteristics have certainly to be explained by a segregation mechanism under equilibrium. The existence of a segregation mechanism under equilibrium has been confirmed by the observation of the acceleration of the vacancies elimination kinetics by boron. The interaction between the boron atoms and the thermal vacancies which migrates to grain boundaries lead to the formation of complexes. The importance of the boron effect is not limited to its role to grain boundaries. Indeed, has been observed a strong decrease of the long order distance in the alloys doped with boron. The structure of the dislocations created by the vacancies

  3. First boronization in KSTAR

    Energy Technology Data Exchange (ETDEWEB)

    Hong, S.H., E-mail: sukhhong@nfri.re.kr [National Fusion Research Institute, 113 Gwahangno, Yusung-Gu, Daejeon 305-333 (Korea, Republic of); Center for Edge Plasma Science (cEps), Hanyang University, Seoul 133-791 (Korea, Republic of); Lee, K.S.; Kim, K.M.; Kim, H.T.; Kim, G.P. [National Fusion Research Institute, 113 Gwahangno, Yusung-Gu, Daejeon 305-333 (Korea, Republic of); Sun, J.H.; Woo, H.J. [Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Center for Edge Plasma Science (cEps), Hanyang University, Seoul 133-791 (Korea, Republic of); Park, J.M.; Kim, W.C.; Kim, H.K.; Park, K.R.; Yang, H.L.; Na, H.K. [National Fusion Research Institute, 113 Gwahangno, Yusung-Gu, Daejeon 305-333 (Korea, Republic of); Chung, K.S. [Department of Electrical Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Center for Edge Plasma Science (cEps), Hanyang University, Seoul 133-791 (Korea, Republic of)

    2010-11-15

    First boronization in KSTAR is reported. KSTAR boronization system is based on a carborane (C{sub 2}B{sub 10}H{sub 12}) injection system. The design, construction, and test of the system are accomplished and it is tested by using a small vacuum vessel before it is mounted to a KSTAR port. After the boronization in KSTAR, impurity levels are significantly reduced by factor of 3 (oxygen) and by 10 (carbon). Characteristics of a-C/B:H thin films deposited by carborane vapor are investigated. Re-condensation of carborane vapor during the test phase has been reported.

  4. Boron in sillimanite.

    Science.gov (United States)

    Grew, E S; Hinthorne, J R

    1983-08-01

    Sillimanite in six granulite-facies, kornerupine-bearing rocks contains 0.035 to 0.43 percent B(2)O(3) and 0.02 to 0.23 percent MgO (by weight). Substitution of boron for silicon and magnesium for aluminum is coupled such that the ratio of magnesium to boron is about 0.5. Sillimanite incorporates more than 0.1 percent B(2)O(3) only at high temperatures in a boron-rich environment at very low partial pressures of water. In the amphibolite facies, the sillimanite boron contents are too low to appreciably affect the stability relations of sillimanite with kyanite and andalusite. PMID:17830955

  5. Boron nitride composites

    Science.gov (United States)

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2016-02-16

    According to one embodiment, a composite product includes hexagonal boron nitride (hBN), and a plurality of cubic boron nitride (cBN) particles, wherein the plurality of cBN particles are dispersed in a matrix of the hBN. According to another embodiment, a composite product includes a plurality of cBN particles, and one or more borate-containing binders.

  6. The influence of boron content on electroanalytical detection of nitrate using BDD electrodes

    Science.gov (United States)

    Matsushima, J. T.; Silva, W. M.; Azevedo, A. F.; Baldan, M. R.; Ferreira, N. G.

    2009-11-01

    Electrochemical response of nitrate reduction was analyzed using Boron Doped Diamond (BDD) films grown with different boron levels and it was correlated with the electrode physico-chemical properties. X-ray photoelectron spectroscopy and contact angle measurements showed the evolution of oxygen content and the weattability associated to the chemical surface modification as boron content increase in such films. Raman spectroscopy showed that the broad peaks at 1220 and 500 cm -1 become more evident with the boron addition. Electrochemical measurements by square wave voltammetry for nitrate reduction showed a strong dependence between the doping level of the BDD film and the nitrate detection. BDD film grown with B/C ratio of 20,000 ppm presented the best sensibility to low concentration of nitrate. This result was analyzed from the linear relationship between the peak currents as a function of the nitrate concentration. This behavior was attributed to the changes in the diamond surface chemical and the film grain size.

  7. The influence of boron content on electroanalytical detection of nitrate using BDD electrodes

    International Nuclear Information System (INIS)

    Electrochemical response of nitrate reduction was analyzed using Boron Doped Diamond (BDD) films grown with different boron levels and it was correlated with the electrode physico-chemical properties. X-ray photoelectron spectroscopy and contact angle measurements showed the evolution of oxygen content and the weattability associated to the chemical surface modification as boron content increase in such films. Raman spectroscopy showed that the broad peaks at 1220 and 500 cm-1 become more evident with the boron addition. Electrochemical measurements by square wave voltammetry for nitrate reduction showed a strong dependence between the doping level of the BDD film and the nitrate detection. BDD film grown with B/C ratio of 20,000 ppm presented the best sensibility to low concentration of nitrate. This result was analyzed from the linear relationship between the peak currents as a function of the nitrate concentration. This behavior was attributed to the changes in the diamond surface chemical and the film grain size.

  8. Effect of alloying on the properties of a cubic boron nitride ceramic

    Energy Technology Data Exchange (ETDEWEB)

    Shipilo, V.B.; Anichenko, N.G.; Rud' , A.E.; Vrublevskii, A.I. (AN BSSR, Institut Fiziki Tverdogo Tela i Poluprovodnikov, Minsk, Belorussian (USSR))

    1990-01-01

    The effect of Group-VI elements on the density, electrical resistance, microhardness, and parallel electron resonance spectra of a cubic boron nitride ceramic was investigated experimentally. It is shown that the above characteristics are determined to a large extent by the concentration and type of dopants. The sensitivity of the physical characteristics to doping and subsequent annealing indicates that the impurities are incorporated in the boron nitride lattice.

  9. Hydrogen-induced boron passivation in Cz Si

    Energy Technology Data Exchange (ETDEWEB)

    Castaldini, A.; Cavalcoli, D.; Cavallini, A. [INFM and Physics Department, Viale Berti Pichat 6/2, 40137 Bologna (Italy); Susi, E. [CNR-LAMEL, Via Gobetti 101, 40129 Bologna (Italy)

    2002-11-01

    Acceptor deactivation in the near-surface region of as-grown, boron-doped Si wafers was detected by in-depth profiles of the free-carrier density obtained by capacitance-voltage measurements. As this deactivation was only observed in wafers subjected to the standard cleaning procedures used in Si manufacturing, we ascribed it to boron passivation by an impurity introduced during the cleaning process. From the study of the free-carrier reactivation kinetics and of the diffusion behaviour of boron-impurity complexes, we have concluded that the impurity is possibly related to hydrogen introduced during the cleaning treatments. The characteristics of the deep level associated with this impurity have been analysed by deep-level transient spectroscopy. (orig.)

  10. Boron non-uniform precipitation in Si at the Ostwald ripening stage

    International Nuclear Information System (INIS)

    The numerical model based on the Ostwald ripening theory is proposed for a non-uniform ensemble of precipitates. The model describes the boron precipitate ensemble layering in Si highly boron pre-doped then highly boron implanted and then high temperature annealed. To make the classical Ostwald ripening model consistent with the experimental data we had introduced three additions in the model. First one concerns the initial distributions of self-interstitials, boron atoms in substitutional positions, and precipitates. Second one declares that the growth/dissolution of precipitates starts gradually from the edges of implanted layer toward Rp. Third one takes into account the enhancement of boron diffusivity in layers with growing precipitates. The adopted model agrees well with experimental data.

  11. Boron non-uniform precipitation in Si at the Ostwald ripening stage

    Energy Technology Data Exchange (ETDEWEB)

    Feklistov, Konstantin, E-mail: kos@thermo.isp.nsc.r [Institute of Semiconductor Physics of SB RAS, Pr-kt akad, Lavrenteva, 13, 630090 Novosibirsk (Russian Federation); Fedina, Ludmila I. [Institute of Semiconductor Physics of SB RAS, Pr-kt akad, Lavrenteva, 13, 630090 Novosibirsk (Russian Federation)

    2009-12-15

    The numerical model based on the Ostwald ripening theory is proposed for a non-uniform ensemble of precipitates. The model describes the boron precipitate ensemble layering in Si highly boron pre-doped then highly boron implanted and then high temperature annealed. To make the classical Ostwald ripening model consistent with the experimental data we had introduced three additions in the model. First one concerns the initial distributions of self-interstitials, boron atoms in substitutional positions, and precipitates. Second one declares that the growth/dissolution of precipitates starts gradually from the edges of implanted layer toward Rp. Third one takes into account the enhancement of boron diffusivity in layers with growing precipitates. The adopted model agrees well with experimental data.

  12. Evolution of Diamond Crystal Shape with Boron Concentration during CVD Growth

    Science.gov (United States)

    Issaoui, R.; Silva, F.; Tallaire, A.; Mille, V.; Achard, J.; Gicquel, A.

    2010-11-01

    Homoepitaxially grown boron-doped diamond films have been extensively studied for many years, in particular for the development of power-electronic devices. Coplanar structures have already been fabricated and characterized but, in such structures, the current is limited by a high series resistance. A vertical component could allow overcoming this issue but this requires that thick heavily boron-doped diamond crystals with a large usable top surface are grown. In this paper we used a 3D geometrical model in order to study the evolution of the crystal shape of thick diamond crystals as a function of boron doping. The growth parameters used in the model were determined by measuring the growth rate in different crystalline orientations. It was found that the addition of boron to the gas phase promotes the appearance of large {110} and {113} crystalline faces. {110} faces have a detrimental effect on the crystal since they can generate large stress and promote crystal break-up. The results predicted by the model are consistent with that obtained for a thick boron-doped diamond single crystal.

  13. Two-dimensional numerical simulation of boron diffusion for pyramidally textured silicon

    Energy Technology Data Exchange (ETDEWEB)

    Ma, Fa-Jun, E-mail: Fajun.Ma@nus.edu.sg; Duttagupta, Shubham [Solar Energy Research Institute of Singapore (SERIS), National University of Singapore, 7 Engineering Drive 1, 117574 (Singapore); Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, 117576 (Singapore); Shetty, Kishan Devappa; Meng, Lei; Hoex, Bram; Peters, Ian Marius [Solar Energy Research Institute of Singapore (SERIS), National University of Singapore, 7 Engineering Drive 1, 117574 (Singapore); Samudra, Ganesh S. [Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, 117576 (Singapore); Solar Energy Research Institute of Singapore (SERIS), National University of Singapore, 7 Engineering Drive 1, 117574 (Singapore)

    2014-11-14

    Multidimensional numerical simulation of boron diffusion is of great relevance for the improvement of industrial n-type crystalline silicon wafer solar cells. However, surface passivation of boron diffused area is typically studied in one dimension on planar lifetime samples. This approach neglects the effects of the solar cell pyramidal texture on the boron doping process and resulting doping profile. In this work, we present a theoretical study using a two-dimensional surface morphology for pyramidally textured samples. The boron diffusivity and segregation coefficient between oxide and silicon in simulation are determined by reproducing measured one-dimensional boron depth profiles prepared using different boron diffusion recipes on planar samples. The established parameters are subsequently used to simulate the boron diffusion process on textured samples. The simulated junction depth is found to agree quantitatively well with electron beam induced current measurements. Finally, chemical passivation on planar and textured samples is compared in device simulation. Particularly, a two-dimensional approach is adopted for textured samples to evaluate chemical passivation. The intrinsic emitter saturation current density, which is only related to Auger and radiative recombination, is also simulated for both planar and textured samples. The differences between planar and textured samples are discussed.

  14. Study on the preparation of boron and erbium co-doped BiVO4 photocatalyst and the photocatalytic degradation of Rhodamine B%硼和铒共掺杂BiVO4光催化降解罗丹明B的研究

    Institute of Scientific and Technical Information of China (English)

    董多; 宋恩军; 车寅生; 杨长秀; 王敏; 高兴莹

    2015-01-01

    通过柠檬酸络合法合成硼和铒共掺杂BiVO4,并对其进行XRD、UV-Vis的表征以分析合成材料的物相、形貌。同时考察溶液的初始浓度、pH、催化剂投加量以及光照强度等因素在可见光的照射下对罗丹明B光催化降解的影响。实验结果表明:在50 mL罗丹明B水溶液中,初始质量浓度为10 mg/L,pH=3,催化剂投加量为0.015 g,光照距离14 cm,B-Er共掺杂BiVO4对罗丹明B有较好的光催化活性,反应50 min后,降解率可达90%以上。%Boron and erbium co-doped BiVO4 visible-light-driven photocatalysts have been synthesized by citric acid complex method. The phase,and morphology of the synthetic material are characterized by XRD and UV-Vis. Mean-while,the effects of the factors,such as solution initial concentration,pH,dosage of catalyst,and illumination inten-sity,on the degradation of Rhodamine B under visible light irradiation are investigated. The experimental results show that boron and erbium co-doped BiVO4 has better photocatalytic activity on Rhodamine B degradation under the following conditions:initial Rhodamine B concentration is 10 mg/L,the volume of solution 50 mL,pH 3 of the hydrothermal reaction, dosage of catalyst 0.015 g and light distance 14 cm. After reacted for 50 min,the degradation rate of Rhodamine B can be more than 90%.

  15. Boronated liposome development and evaluation

    Energy Technology Data Exchange (ETDEWEB)

    Hawthorne, M.F. [Univ. of California, Los Angeles, CA (United States)

    1995-11-01

    The boronated liposome development and evaluation effort consists of two separate tasks. The first is the development of new boron compounds and the synthesis of known boron species with BNCT potential. These compounds are then encapsulated within liposomes for the second task, biodistribution testing in tumor-bearing mice, which examines the potential for the liposomes and their contents to concentrate boron in cancerous tissues.

  16. Characteristics of Boron Decorated TiO2 Nanoparticles for Dye-Sensitized Solar Cell Photoanode

    Directory of Open Access Journals (Sweden)

    Ching-Yuan Ho

    2015-01-01

    Full Text Available Different boron weight percents on mixed-phase (anatase and rutile TiO2 nanoparticles were synthesized to investigate structure morphology, defect states, luminescence properties, and energy conversion. The measured results indicate that boron doping of TiO2 both increases the crystallite size and rutile-phase percent in an anatase matrix. Decreasing the band gap by boron doping can extend the absorption to the visible region, while undoped TiO2 exhibits high UV absorption. Oxygen vacancy defects generated by boron ions reduce Ti+4 and affect electron transport in dye-sensitized solar cells. Excess electrons originating from the oxygen vacancies of doped TiO2 downward shift in the conduction band edge and prompt the transfer of photoelectrons from the conduction band of the rutile phase to the lower energy anatase trapping sites; they then separate charges to enhance the photocurrent and Jsc. Although the resistance of the electron recombination (Rk between doped TiO2 photoanode and the electrolyte for the doped TiO2 sample is lower, a longer electron lifetime (τ of 19.7 ms with a higher electron density (ns of 2.1 × 1018 cm−3 contributes to high solar conversion efficiency.

  17. Structural and electrical properties of trimethylboron-doped silicon nanowires

    Science.gov (United States)

    Lew, Kok-Keong; Pan, Ling; Bogart, Timothy E.; Dilts, Sarah M.; Dickey, Elizabeth C.; Redwing, Joan M.; Wang, Yanfeng; Cabassi, Marco; Mayer, Theresa S.; Novak, Steven W.

    2004-10-01

    Trimethylboron (TMB) was investigated as a p-type dopant source for the vapor-liquid-solid growth of boron-doped silicon nanowires (SiNWs). The boron concentration in the nanowires was measured using secondary ion mass spectrometry and results were compared for boron-doping using TMB and diborane (B2H6) sources. Boron concentrations ranging from 1×1018 to 4×1019cm-3 were obtained by varying the inlet dopant/SiH4 gas ratio. TEM characterization revealed that the B2H6-doped SiNWs consisted of a crystalline core with a thick amorphous Si coating, while the TMB-doped SiNWs were predominantly single crystal even at high boron concentrations. The difference in structural properties was attributed to the higher thermal stability and reduced reactivity of TMB compared to B2H6. Four-point resistivity and gate-dependent conductance measurements were used to confirm p-type conductivity in the TMB-doped nanowires and to investigate the effect of dopant concentration on nanowire resistivity.

  18. Raman effect in icosahedral boron-rich solids

    Directory of Open Access Journals (Sweden)

    Helmut Werheit, Volodymyr Filipov, Udo Kuhlmann, Ulrich Schwarz, Marc Armbrüster, Andreas Leithe-Jasper, Takaho Tanaka, Iwami Higashi, Torsten Lundström, Vladimir N Gurin and Maria M Korsukova

    2010-01-01

    Full Text Available We present Raman spectra of numerous icosahedral boron-rich solids having the structure of α-rhombohedral, β-rhombohedral, α-tetragonal, β-tetragonal, YB66, orthorhombic or amorphous boron. The spectra were newly measured and, in some cases, compared with reported data and discussed. We emphasize the importance of a high signal-to-noise ratio in the Raman spectra for detecting weak effects evoked by the modification of compounds, accommodation of interstitial atoms and other structural defects. Vibrations of the icosahedra, occurring in all the spectra, are interpreted using the description of modes in α-rhombohedral boron by Beckel et al. The Raman spectrum of boron carbide is largely clarified. Relative intra- and inter-icosahedral bonding forces are estimated for the different structural groups and for vanadium-doped β-rhombohedral boron. The validity of Badger's rule is demonstrated for the force constants of inter-icosahedral B–B bonds, whereas the agreement is less satisfactory for the intra-icosahedral B–B bonds.

  19. Phonon transport in single-layer boron nanoribbons.

    Science.gov (United States)

    Zhang, Zhongwei; Xie, Yuee; Peng, Qing; Chen, Yuanping

    2016-11-01

    Inspired by the successful synthesis of three two-dimensional (2D) allotropes, the boron sheet has recently been one of the hottest 2D materials around. However, to date, phonon transport properties of these new materials are still unknown. By using the non-equilibrium Green's function (NEGF) combined with the first principles method, we study ballistic phonon transport in three types of boron sheets; two of them correspond to the structures reported in the experiments, while the third one is a stable structure that has not been synthesized yet. At room temperature, the highest thermal conductance of the boron nanoribbons is comparable with that of graphene, while the lowest thermal conductance is less than half of graphene's. Compared with graphene, the three boron sheets exhibit diverse anisotropic transport characteristics. With an analysis of phonon dispersion, bonding charge density, and simplified models of atomic chains, the mechanisms of the diverse phonon properties are discussed. Moreover, we find that many hybrid patterns based on the boron allotropes can be constructed naturally without doping, adsorption, and defects. This provides abundant nanostructures for thermal management and thermoelectric applications. PMID:27669055

  20. Phonon transport in single-layer boron nanoribbons

    Science.gov (United States)

    Zhang, Zhongwei; Xie, Yuee; Peng, Qing; Chen, Yuanping

    2016-11-01

    Inspired by the successful synthesis of three two-dimensional (2D) allotropes, the boron sheet has recently been one of the hottest 2D materials around. However, to date, phonon transport properties of these new materials are still unknown. By using the non-equilibrium Green’s function (NEGF) combined with the first principles method, we study ballistic phonon transport in three types of boron sheets; two of them correspond to the structures reported in the experiments, while the third one is a stable structure that has not been synthesized yet. At room temperature, the highest thermal conductance of the boron nanoribbons is comparable with that of graphene, while the lowest thermal conductance is less than half of graphene’s. Compared with graphene, the three boron sheets exhibit diverse anisotropic transport characteristics. With an analysis of phonon dispersion, bonding charge density, and simplified models of atomic chains, the mechanisms of the diverse phonon properties are discussed. Moreover, we find that many hybrid patterns based on the boron allotropes can be constructed naturally without doping, adsorption, and defects. This provides abundant nanostructures for thermal management and thermoelectric applications.

  1. Ultrafast optical nonlinearity and photoacoustic studies on chitosan-boron nitride nanotube composite films

    Science.gov (United States)

    Kuthirummal, Narayanan; Philip, Reji; Mohan, Athira; Jenks, Cassidy; Levi-Polyachenko, Nicole

    2016-07-01

    Ultrafast optical nonlinearity in chitosan (CS) films doped with multi-walled boron nitride nanotubes (MWBN) has been investigated using 800 nm, 100 fs laser pulses, employing the open aperture Z-scan technique. Two-photon absorption coefficients (β) of CS-MWBN films have been measured at 800 nm by Z-scan. While chitosan with 0.01% MWBN doping gives a β value of 0.28×10-13 m/W, 1% doping results in a higher β value of 1.43×10-13 m/W, showing nonlinearity enhancement by a factor of 5. These nonlinearity coefficients are comparable to those reported for silver nanoclusters in glass matrix and Pt-PVA nanocomposites, indicating potential photonic applications for MWBN doped chitosan films. Characterization of the synthesized films using Fourier transform infrared photoacoustic spectroscopy (FTIR-PAS) reveals significant interactions between the NH and CO groups of chitosan with boron nitride.

  2. Bright prospects for boron

    NARCIS (Netherlands)

    Wassink, J.

    2012-01-01

    Professor Lis Nanver at Dimes has laid the foundation for a range of new photodetectors by creating a thin coating of boron on a silicon substrate. The sensors are used in ASML’s latest lithography machines and FEI’s most sensitive electron microscopes.

  3. Boron contamination in drinking - irrigation water and boron removal methods

    Directory of Open Access Journals (Sweden)

    Meltem Bilici Başkan

    2014-03-01

    Full Text Available Boron presents in IIIA group of periodic table and has high ionization capacity. Therefore it is classified as a metalloid. Average boron concentration in earth's crust is 10 mg/kg. It presents in the environment as a salts of Ca, Na, and Mg. Boron reserves having high concentration and economical extent are found mostly in Turkey and in arid, volcanic and high hydrothermal activity regions of U.S. as compounds of boron attached to oxygen. Boron is an essential micronutrient for plants, although it may be toxic at higher levels. The range in which it is converted from a nutrient to a contaminant is quite narrow. Boron presents in water environment as a boric acid and rarely borate salts. The main boron sources, whose presence is detected in surface waters, are urban wastes and industrial wastes, which can come from a wide range of different activities as well as several chemical products used in agriculture. In Turkey, the most pollutant toxic element in drinking and irrigation water is boron. Therefore boron removal is very important in terms of human health and agricultural products in high quality. Mainly boron removal methods from drinking water and irrigation water are ion exchange, ultrafiltration, reverse osmosis, and adsorption.

  4. Plasma boron and the effects of boron supplementation in males.

    Science.gov (United States)

    Green, N R; Ferrando, A A

    1994-11-01

    Recently, a proliferation of athletic supplements has been marketed touting boron as an ergogenic aid capable of increasing testosterone. The effect of boron supplementation was investigated in male bodybuilders. Ten male bodybuilders (aged 20 to 26) were given a 2.5-mg boron supplement, while nine male bodybuilders (aged 21 to 27) were given a placebo for 7 weeks. Plasma total and free testosterone, plasma boron, lean body mass, and strength measurements were determined on day 1 and day 49 of the study. A microwave digestion procedure followed by inductively coupled argon plasma spectroscopy was used for boron determination. Twelve subjects had boron values at or above the detection limit with median value of 25 ng/ml (16 ng/ml lower quartile and 33 ng/ml upper quartile). Of the ten subjects receiving boron supplements, six had an increase in their plasma boron. Analysis of variance indicated no significant effect of boron supplementation on any of the other dependent variables. Both groups demonstrated significant increases in total testosterone (p bodybuilding can increase total testosterone, lean body mass, and strength in lesser-trained bodybuilders, but boron supplementation affects these variables not at all.

  5. Methods of producing continuous boron carbide fibers

    Energy Technology Data Exchange (ETDEWEB)

    Garnier, John E.; Griffith, George W.

    2015-12-01

    Methods of producing continuous boron carbide fibers. The method comprises reacting a continuous carbon fiber material and a boron oxide gas within a temperature range of from approximately 1400.degree. C. to approximately 2200.degree. C. Continuous boron carbide fibers, continuous fibers comprising boron carbide, and articles including at least a boron carbide coating are also disclosed.

  6. Durability of doped zinc oxide/silver/doped zinc oxide low emissivity coatings in humid environment

    Energy Technology Data Exchange (ETDEWEB)

    Ando, E. [Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755 (Japan)], E-mail: eiichi-ando@agc.co.jp; Miyazaki, M. [Research Center, Asahi Glass Co., Ltd., 1150 Hazawa-cho, Kanagawa-ku, Yokohama 221-8755 (Japan)

    2008-05-30

    The relationship between internal stress of doped zinc oxide films and durability of doped zinc oxide/silver/doped zinc oxide low emissivity (low-e) coatings in humid environment was investigated. Aluminum, titanium, tin, chromium, silicon, gallium, magnesium, boron, barium, and calcium were chosen as a doping element in sputtering targets. Ratios of dopant/zinc in the oxide targets were 4/96-5/95 at.%. Films were formed by radio frequency sputtering. Doping of barium and calcium to the zinc oxide film led to a large increase in the internal stress. Doping of the other elements resulted in decreasing the internal stress. It was concluded that durability of the low-e coatings in humid environment closely correlated with the internal stress of the oxide layers.

  7. Oxidation of Silicon and Boron in Boron Containing Molten Iron

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    A new process of directly smelting boron steel from boron-containing pig iron has been established. The starting material boron-containing pig iron was obtained from ludwigite ore, which is very abundant in the eastern area of Liaoning Province of China. The experiment was performed in a medium-frequency induction furnace, and Fe2O3 powder was used as the oxidizing agent. The effects of temperature, addition of Fe2O3, basicity, stirring, and composition of melt on the oxidation of silicon and boron were investigated respectively. The results showed that silicon and boron were oxidized simultaneously and their oxidation ratio exceeded 90% at 1 400 ℃. The favorable oxidation temperature of silicon was about 1 300-1 350 C. High oxygen potential of slag and strong stirring enhanced the oxidation of silicon and boron.

  8. Mapping boron in silicon solar cells using electron energy-loss spectroscopy

    DEFF Research Database (Denmark)

    Duchamp, Martial; Boothroyd, Chris; Kovács, András;

    2011-01-01

    Electron energy-loss spectroscopy (EELS) is used to study the B distribution in a p-i-n layered solar cell structure. The boron concentration in the p-doped Si layer is expected to be ~1021 cm−3 and should not exceed 1017 cm−3 in the neighbouring intrinsic layer. We show that B concentrations as ...

  9. An atom probe field ion microscope investigation of the role of boron in precipitates and at grain boundaries in NiAl

    International Nuclear Information System (INIS)

    This paper reports that the high resolution analytical technique of Atom Probe Field Ion Microscopy (APFIM) has been used to characterize grain boundaries and the matrix of a stoichiometric NiAl alloy doped with 0.04 (100 wppm) and 0.12 at. % (300 wppm) boron. Field ion images revealed boron segregation to the grain boundaries. Atom probe elemental analysis of the grain boundaries measured a boron coverage of up to 30% of a monolayer. Extensive atom probe analyses also revealed a fine dispersion of nanoscale boride precipitates in the matrix. The boron segregation to the grain boundaries was found to correlate with the observed suppression of intergranular fracture. However, the decrease in ductility of boron-doped NiAl is attributed in part to the precipitation hardening effect of the boride phases

  10. Structures, stability, mechanical and electronic properties of α-boron and α*-boron

    OpenAIRE

    Chaoyu He; Zhong, J. X.

    2013-01-01

    The structures, stability, mechanical and electronic properties of α-boron and a promising metastable boron phase (α*-boron) have been studied by first-principles calculations. α-boron and α*-boron consist of equivalent icosahedra B12 clusters in different connecting configurations of “3S-6D-3S” and “2S-6D-4S”, respectively. The total energy calculations show that α*-boron is less stable than α-boron but more favorable than the well-known β-boron and γ-boron at zero pressure. Both α-boron and...

  11. Fivefold twinned boron carbide nanowires.

    Science.gov (United States)

    Fu, Xin; Jiang, Jun; Liu, Chao; Yuan, Jun

    2009-09-01

    Chemical composition and crystal structure of fivefold twinned boron carbide nanowires have been determined by electron energy-loss spectroscopy and electron diffraction. The fivefold cyclic twinning relationship is confirmed by systematic axial rotation electron diffraction. Detailed chemical analysis reveals a carbon-rich boron carbide phase. Such boron carbide nanowires are potentially interesting because of their intrinsic hardness and high temperature thermoelectric property. Together with other boron-rich compounds, they may form a set of multiply twinned nanowire systems where the misfit strain could be continuously tuned to influence their mechanical properties.

  12. Two-dimensional boron: Lightest catalyst for hydrogen and oxygen evolution reaction

    Science.gov (United States)

    Mir, Showkat H.; Chakraborty, Sudip; Jha, Prakash C.; Wärnâ, John; Soni, Himadri; Jha, Prafulla K.; Ahuja, Rajeev

    2016-08-01

    The hydrogen evolution reaction (HER) and the oxygen evolution reaction (OER) have been envisaged on a two-dimensional (2D) boron sheet through electronic structure calculations based on a density functional theory framework. To date, boron sheets are the lightest 2D material and, therefore, exploring the catalytic activity of such a monolayer system would be quite intuitive both from fundamental and application perspectives. We have functionalized the boron sheet (BS) with different elemental dopants like carbon, nitrogen, phosphorous, sulphur, and lithium and determined the adsorption energy for each case while hydrogen and oxygen are on top of the doping site of the boron sheet. The free energy calculated from the individual adsorption energy for each functionalized BS subsequently guides us to predict which case of functionalization serves better for the HER or the OER.

  13. Characterization of pure boron depositions integrated in silicon diodes for nanometer-deep junction applications

    OpenAIRE

    Sarubbi, F.

    2010-01-01

    Doping technologies for formation of ultrashallow and highly-doped p+ junctions are continuously demanded to face the challenges in front-end processing that have emerged due to the aggressive downscaling of vertical dimensions for future semiconductor devices. As an alternative to implantations, current solutions are based on in-situ boron (B) doping during Si/SiGe chemical vapor deposition (CVD) by using diborane (B2H6) as the dopant gas. In this context, a few studies have demonstrated p+-...

  14. Effect of Structure of Ti/Boron-doped Diamond Electrode on the Electrochemical Degradation Performance for Aspirin%多孔钛基掺硼金刚石电极结构对电催化降解阿司匹林性能的影响

    Institute of Scientific and Technical Information of China (English)

    黄卫民; 林海波

    2015-01-01

    The surface morphology and crystal structure of three-dimensional 3 D-porous titanium/boron-doped diamond( porous Ti/BDD ) and planar Ti/BDD electrodes were studied by scanning electron microscopy (SEM) and X-ray diffraction(XRD). The cyclic voltammetry measurements of porous Ti/BDD and planar Ti/BDD electrodes were also performed. Porous Ti/BDD and planar Ti/BDD electrodes were used as anodes in the degradation of Aspirin, respectively. The results indicate that porous Ti/BDD has larger total, outer, and inner charges, porosity, and actual surface area due to the porous structure. Compared to planar Ti/PDD, porous Ti/BDD electrode is better on removal rate of chemical oxygen demand( COD) and Aspirin and energy consumption.%利用扫描电子显微镜( SEM)和X射线衍射仪( XRD)对多孔Ti/BDD电极及传统平板Ti/BDD( BDD =钛基掺硼金刚石)电极进行了研究,通过循环伏安法考察了电极的背景电流和电化学窗口。以阿司匹林为模型污染物,研究了BDD电极结构对阿司匹林电催化降解的影响。结果表明,多孔Ti/BDD电极的总带电量,内、外部带电量,孔隙率和比表面积均高于平板Ti/BDD电极;多孔Ti/BDD在对COD和阿司匹林的去除率和能量消耗等方面均优于平板Ti/BDD电极。

  15. Graphite–boron composite heater in a Kawai-type apparatus: the inhibitory effect of boron oxide and countermeasures

    Science.gov (United States)

    Xie, Longjian; Yoneda, Akira; Yoshino, Takashi; Fei, Hongzhan; Ito, Eiji

    2016-04-01

    We have investigated the performance of a graphite-boron composite (GBC) with 3 wt % boron as a precursor for a boron-doped diamond heater in a Kawai-type apparatus at 15 GPa. We first tested a machinable cylinder of GBC sintered at 1000°C in Ar/H2 gas (99:1 molar ratio). Boron oxide (B2O3) formed during sintering frequently hindered the GBC heater from stable operation at temperatures higher than 1400°C by producing melt throughout the heater together with oxide and/or silicates. We then rinsed the GBC heater in hydrochloric acid to remove B2O3. After rinsing, we succeeded in stably generating temperatures higher than 2000°C. We also improved a molding process of different-sized GBC tubes for convenient use and tested the molded GBC heater. It was free from the B2O3 problem. The electromotive force of the W/Re thermocouple was successfully monitored up to 2400°C.

  16. Effect of thermal annealing on the optical and electrical properties of boron doped a-SiO{sub x}:H for thin-film silicon solar cell applications

    Energy Technology Data Exchange (ETDEWEB)

    Park, Jinjoo [College of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of); Shin, Chonghoon [Department of Energy Science, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of); Lee, Sunwha [College of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of); Applied Optics and Energy Research Group, Korea Institute of Industrial Technology, Oryong-dong 1110-9, Buk-ku, Gwangju 506-824 (Korea, Republic of); Kim, Sunbo; Jung, Junhee; Balaji, Nagarajan [Department of Energy Science, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of); Dao, Vinh Ai; Lee, Youn-Jung [College of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of); Yi, Junsin, E-mail: yi@yurim.skku.ac.kr [College of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746 (Korea, Republic of)

    2015-07-31

    The p-type layer in a p-i-n thin-film solar cell plays a crucial role in determining efficiency. The requirements for p-type layer films are high optical band gap (E{sub g}), narrow valence band tail to minimize optical absorption, high dark conductivity, and low activation energy to reduce the parasitic series resistance of the solar cell. We investigated the effects of temperature during film growth and post-deposition thermal annealing on the optical and electronic properties of p-type amorphous silicon oxide films (p-a-SiO{sub x}:H) for thin-film silicon solar cell applications. The activation energy of thermally annealed p-a-SiO{sub x}:H film prepared at low substrate temperature decreased from 0.72 eV to 0.56 eV with similar E{sub g}. Our improvements are explained in the changed ratio of conjugation with the three- and four-fold coordinated boron atoms by the shift of the B (1 s) X-ray photoelectron spectrum. Taking into account the reversible electrical change by thermal annealing while maintaining high optical properties, we propose necessary process-procedure conditions for obtaining high photovoltaic performance in thin-film-Si solar cells with high-quality p-a-SiO{sub x}:H. We carried out device modeling of p-i-n junction amorphous silicon solar cells by employing a thermal annealing effect on p-type a-SiO{sub x}:H layer, using an advanced semiconductor analysis simulator. Due to reduced E{sub a} with high E{sub g} of p-type a-SiO{sub x}:H layer after thermal annealing, the solar cell performance of the open circuit voltage, fill factor, and conversion efficiency improved by 11.1%, 60.42%, and 53.75%, respectively. - Highlights: • We investigated the effects thermal annealing on p-a-SiO{sub x}:H films. • The E{sub a} property of annealed p-a-SiO{sub x}:H film prepared at low temperature decreased. • The simulated performance of solar cell with annealed p-type a-SiO{sub x}:H improved.

  17. Functionalized boron nitride nanotubes

    Science.gov (United States)

    Sainsbury, Toby; Ikuno, Takashi; Zettl, Alexander K

    2014-04-22

    A plasma treatment has been used to modify the surface of BNNTs. In one example, the surface of the BNNT has been modified using ammonia plasma to include amine functional groups. Amine functionalization allows BNNTs to be soluble in chloroform, which had not been possible previously. Further functionalization of amine-functionalized BNNTs with thiol-terminated organic molecules has also been demonstrated. Gold nanoparticles have been self-assembled at the surface of both amine- and thiol-functionalized boron nitride Nanotubes (BNNTs) in solution. This approach constitutes a basis for the preparation of highly functionalized BNNTs and for their utilization as nanoscale templates for assembly and integration with other nanoscale materials.

  18. Spectroscopic ellipsometry of homoepitaxial diamond multilayers and delta-doped structures

    Energy Technology Data Exchange (ETDEWEB)

    Bousquet, J.; Chicot, G.; Eon, D.; Bustarret, E. [Univ. Grenoble Alpes, Inst. NEEL, F-38042 Grenoble (France); CNRS, Inst. NEEL, F-38042 Grenoble (France)

    2014-01-13

    The optimization of diamond-based unipolar electronic devices such as pseudo-vertical Schottky diodes or delta-doped field effect transistors relies in part on the sequential growth of nominally undoped (p{sup –}) and heavily boron doped (p{sup ++}) layers with well-controlled thicknesses and steep interfaces. Optical ellipsometry offers a swift and contactless method to characterize the thickness, roughness, and electronic properties of semiconducting and metallic diamond layers. We report ellipsometric studies carried out on delta-doped structures and other epitaxial multilayers with various boron concentrations and thicknesses (down to the nanometer range). The results are compared with Secondary Ion Mass Spectroscopy and transport measurements.

  19. Spectroscopic ellipsometry of homoepitaxial diamond multilayers and delta-doped structures

    International Nuclear Information System (INIS)

    The optimization of diamond-based unipolar electronic devices such as pseudo-vertical Schottky diodes or delta-doped field effect transistors relies in part on the sequential growth of nominally undoped (p–) and heavily boron doped (p++) layers with well-controlled thicknesses and steep interfaces. Optical ellipsometry offers a swift and contactless method to characterize the thickness, roughness, and electronic properties of semiconducting and metallic diamond layers. We report ellipsometric studies carried out on delta-doped structures and other epitaxial multilayers with various boron concentrations and thicknesses (down to the nanometer range). The results are compared with Secondary Ion Mass Spectroscopy and transport measurements

  20. Impact of implanted phosphorus on the diffusivity of boron and its applicability to silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Schrof, Julian, E-mail: julian.schrof@ise.fraunhofer.de; Müller, Ralph; Benick, Jan; Hermle, Martin [Fraunhofer Institute for Solar Energy Systems (ISE), Heidenhofstrasse 2, D-79110 Freiburg (Germany); Reedy, Robert C. [National Renewable Energy Laboratory (NREL), 15013 Denver West Parkway, Golden, Colorado 80401 (United States)

    2015-07-28

    Boron diffusivity reduction in extrinsically doped silicon was investigated in the context of a process combination consisting of BBr{sub 3} furnace diffusion and preceding Phosphorus ion implantation. The implantation of Phosphorus leads to a substantial blocking of Boron during the subsequent Boron diffusion. First, the influences of ion implantation induced point defects as well as the initial P doping on B diffusivity were studied independently. Here, it was found that not the defects created during ion implantation but the P doping itself results in the observed B diffusion retardation. The influence of the initial P concentration was investigated in more detail by varying the P implantation dose. A secondary ion mass spectrometry (SIMS) analysis of the BSG layer after the B diffusion revealed that the B diffusion retardation is not due to potential P content in the BSG layer but rather caused by the n-type doping of the crystalline silicon itself. Based on the observations the B diffusion retardation was classified into three groups: (i) no reduction of B diffusivity, (ii) reduced B diffusivity, and (iii) blocking of the B diffusion. The retardation of B diffusion can well be explained by the phosphorus doping level resulting in a Fermi level shift and pairing of B and P ions, both reducing the B diffusivity. Besides these main influences, there are probably additional transient phenomena responsible for the blocking of boron. Those might be an interstitial transport mechanism caused by P diffusion that reduces interstitial concentration at the surface or the silicon/BSG interface shift due to oxidation during the BBr{sub 3} diffusion process. Lifetime measurements revealed that the residual (non-blocked) B leads to an increased dark saturation current density in the P doped region. Nevertheless, electrical quality is on a high level and was further increased by reducing the B dose as well as by removing the first few nanometers of the silicon surface after