WorldWideScience

Sample records for automated mask creation

  1. Dockomatic - automated ligand creation and docking

    Directory of Open Access Journals (Sweden)

    Hampikian Greg

    2010-11-01

    Full Text Available Abstract Background The application of computational modeling to rationally design drugs and characterize macro biomolecular receptors has proven increasingly useful due to the accessibility of computing clusters and clouds. AutoDock is a well-known and powerful software program used to model ligand to receptor binding interactions. In its current version, AutoDock requires significant amounts of user time to setup and run jobs, and collect results. This paper presents DockoMatic, a user friendly Graphical User Interface (GUI application that eases and automates the creation and management of AutoDock jobs for high throughput screening of ligand to receptor interactions. Results DockoMatic allows the user to invoke and manage AutoDock jobs on a single computer or cluster, including jobs for evaluating secondary ligand interactions. It also automates the process of collecting, summarizing, and viewing results. In addition, DockoMatic automates creation of peptide ligand .pdb files from strings of single-letter amino acid abbreviations. Conclusions DockoMatic significantly reduces the complexity of managing multiple AutoDock jobs by facilitating ligand and AutoDock job creation and management.

  2. Dockomatic - automated ligand creation and docking.

    Science.gov (United States)

    Bullock, Casey W; Jacob, Reed B; McDougal, Owen M; Hampikian, Greg; Andersen, Tim

    2010-11-08

    The application of computational modeling to rationally design drugs and characterize macro biomolecular receptors has proven increasingly useful due to the accessibility of computing clusters and clouds. AutoDock is a well-known and powerful software program used to model ligand to receptor binding interactions. In its current version, AutoDock requires significant amounts of user time to setup and run jobs, and collect results. This paper presents DockoMatic, a user friendly Graphical User Interface (GUI) application that eases and automates the creation and management of AutoDock jobs for high throughput screening of ligand to receptor interactions. DockoMatic allows the user to invoke and manage AutoDock jobs on a single computer or cluster, including jobs for evaluating secondary ligand interactions. It also automates the process of collecting, summarizing, and viewing results. In addition, DockoMatic automates creation of peptide ligand .pdb files from strings of single-letter amino acid abbreviations. DockoMatic significantly reduces the complexity of managing multiple AutoDock jobs by facilitating ligand and AutoDock job creation and management.

  3. A pattern-based method to automate mask inspection files

    Science.gov (United States)

    Kamal Baharin, Ezni Aznida Binti; Muhsain, Mohamad Fahmi Bin; Ahmad Ibrahim, Muhamad Asraf Bin; Ahmad Noorhani, Ahmad Nurul Ihsan Bin; Sweis, Jason; Lai, Ya-Chieh; Hurat, Philippe

    2017-03-01

    Mask inspection is a critical step in the mask manufacturing process in order to ensure all dimensions printed are within the needed tolerances. This becomes even more challenging as the device nodes shrink and the complexity of the tapeout increases. Thus, the amount of measurement points and their critical dimension (CD) types are increasing to ensure the quality of the mask. In addition to the mask quality, there is a significant amount of manpower needed when the preparation and debugging of this process are not automated. By utilizing a novel pattern search technology with the ability to measure and report match region scan-line (edge) measurements, we can create a flow to find, measure and mark all metrology locations of interest and provide this automated report to the mask shop for inspection. A digital library is created based on the technology product and node which contains the test patterns to be measured. This paper will discuss how these digital libraries will be generated and then utilized. As a time-critical part of the manufacturing process, this can also reduce the data preparation cycle time, minimize the amount of manual/human error in naming and measuring the various locations, reduce the risk of wrong/missing CD locations, and reduce the amount of manpower needed overall. We will also review an example pattern and how the reporting structure to the mask shop can be processed. This entire process can now be fully automated.

  4. Economics of automation for the design-to-mask interface

    Science.gov (United States)

    Erck, Wesley

    2009-04-01

    Mask order automation has increased steadily over the years through a variety of individual mask customer implementations. These have been supported by customer-specific software at the mask suppliers to support the variety of customer output formats. Some customers use the SEMI P10 1 standard, some use supplier-specific formats, and some use customer-specific formats. Some customers use little automation and depend instead on close customer-supplier relationships. Implementations are varied in quality and effectiveness. A major factor which has prolonged the adoption of more advanced and effective solutions has been a lack of understanding of the economic benefits. Some customers think standardized automation mainly benefits the mask supplier in order entry automation, but this ignores a number of other significant benefits which differ dramatically for each party in the supply chain. This paper discusses the nature of those differing advantages and presents simple models suited to four business cases: integrated device manufacturers (IDM), fabless companies, foundries and mask suppliers. Examples and estimates of the financial advantages for these business types will be shown.

  5. Automated Agent Ontology Creation for Distributed Databases

    Science.gov (United States)

    2004-03-01

    Query Agent ..……………………………………………………47 3.3 Database Agent Implementation…………………………………………………..48 3.3.1 Leader Election Procedure...algorithm. Section 3.3.1 details the leader election process, Section 3.3.2 discusses the Jaro method, and Section 3.3.3 details the ontology creation...Receives new number Receives new number from Agent2 from Agent2 Figure 3-2. Agent leader communication 49 3.3.1 Leader Election Procedure Figure

  6. Results from the first fully automated PBS-mask process and pelliclization

    Science.gov (United States)

    Oelmann, Andreas B.; Unger, Gerd M.

    1994-02-01

    Automation is widely discussed in IC- and mask-manufacturing and partially realized everywhere. The idea for the automation goes back to 1978, when it turned out that the operators for the then newly installed PBS-process-line (the first in Europe) should be trained to behave like robots for particle reduction gaining lower defect densities on the masks. More than this goal has been achieved. It turned out recently, that the automation with its dedicated work routes and detailed documentation of every lot (individual mask or reticle) made it easy to obtain the CEEC certificate which includes ISO 9001.

  7. Evaluation of Setup Uncertainties for Single-Fraction SRS by Comparing the Two Different Mask-Creation Methods

    CERN Document Server

    Baek, Jong Geun; Oh, Young Kee; Lee, Hyun Jeong; Kim, Eng Chan

    2015-01-01

    The purpose of this study was to evaluate the setup uncertainties for single-fraction stereotactic radiosurgery (SF-SRS) based on the clinical data with the two different mask-creation methods using pretreatment CBCT imaging guidance. Dedicated frameless fixation BrainLAB masks for 23 patients were created as a routine mask (R-mask) making method, as explained in the BrainLAB user manual. The alternative masks (A-mask) which were created by modifying the cover range of the R-mask for the patient head were used for 23 patients. The systematic errors including the each mask and stereotactic target localizer were analyzed and the errors were calculated as the mean and standard deviation (SD) from the LR, SI, AP, and yaw setup corrections. In addition, the frequency of three-dimensional (3D) vector length were also analyzed. The values of the mean setup corrections for the R-mask in all directions were small; < 0.7 mm and < 0.1 degree, whereas the magnitudes of the SDs were relatively large compared to the ...

  8. Methodical Approaches to Creation of Dividing Automation at Industrial Enterprises with Generating Power Plants

    Directory of Open Access Journals (Sweden)

    E. V. Kalentionok

    2010-01-01

    Full Text Available The paper considers a problem pertaining to creation of dividing automation at industrial enterprises which have their own generating plants. Algorithms for action of dividing automation that permit to ensure minimum possible power non-balance while using generating plants for autonomous operation and possible parameters for its response are proposed in the paper.

  9. Development of an automated multiple-target mask CD disposition system to enable new sampling strategy

    Science.gov (United States)

    Ma, Jian; Farnsworth, Jeff; Bassist, Larry; Cui, Ying; Mammen, Bobby; Padmanaban, Ramaswamy; Nadamuni, Venkatesh; Kamath, Muralidhar; Buckmann, Ken; Neff, Julie; Freiberger, Phil

    2006-03-01

    Traditional mask critical dimension (CD) disposition systems with only one or two targets is being challenged by the new requirements from mask-users as the wafer process control becomes more complicated in the newer generation of technologies. Historically, the mask shop does not necessarily measure and disposition off the same kind of CD structures that wafer fabs do. Mask disposition specifications and structures come from the frame-design and the tapeout, while wafer-level CD dispositions are mainly based on the historical process window established per CD-skew experiments and EOL (end of line) yield. In the current high volume manufacturing environment, the mask CDs are mainly dispositioned off their mean-to-target (MTT) and uniformity (6sigma) on one or two types of pre-determined structures. The disposition specification is set to ensure the printed mask will meet the design requirements and to ensure minimum deviation from them. The CD data are also used to adjust the dose of the mask exposure tools to control CD MTT. As a result, the mask CD disposition automation system was built to allow only one or two kinds of targets at most. In contrast, wafer-fabs measure a fairly wide range of different structures to ensure their process is on target and in control. The number of such structures that are considered critical is increasing due the growing complexity of the technology. To fully comprehend the wafer-level requirements, it is highly desirable to align the mask CD sample site and disposition to be the same as that of the wafer-fabs, to measure the OPC (optical proximity correction) structures or equivalent whenever possible, and to establish the true correlation between mask CD measurements vs. wafer CD measurement. In this paper, the development of an automated multiple-target mask CD disposition system with the goal of enabling new sampling strategy is presented. The pros and cons of its implementation are discussed. The new system has been inserted in

  10. Automated CD-SEM recipe creation technology for mass production using CAD data

    Science.gov (United States)

    Kawahara, Toshikazu; Yoshida, Masamichi; Tanaka, Masashi; Ido, Sanyu; Nakano, Hiroyuki; Adachi, Naokaka; Abe, Yuichi; Nagatomo, Wataru

    2011-03-01

    Critical Dimension Scanning Electron Microscope (CD-SEM) recipe creation needs sample preparation necessary for matching pattern registration, and recipe creation on CD-SEM using the sample, which hinders the reduction in test production cost and time in semiconductor manufacturing factories. From the perspective of cost reduction and improvement of the test production efficiency, automated CD-SEM recipe creation without the sample preparation and the manual operation has been important in the production lines. For the automated CD-SEM recipe creation, we have introduced RecipeDirector (RD) that enables the recipe creation by using Computer-Aided Design (CAD) data and text data that includes measurement information. We have developed a system that automatically creates the CAD data and the text data necessary for the recipe creation on RD; and, for the elimination of the manual operation, we have enhanced RD so that all measurement information can be specified in the text data. As a result, we have established an automated CD-SEM recipe creation system without the sample preparation and the manual operation. For the introduction of the CD-SEM recipe creation system using RD to the production lines, the accuracy of the pattern matching was an issue. The shape of design templates for the matching created from the CAD data was different from that of SEM images in vision. Thus, a development of robust pattern matching algorithm that considers the shape difference was needed. The addition of image processing of the templates for the matching and shape processing of the CAD patterns in the lower layer has enabled the robust pattern matching. This paper describes the automated CD-SEM recipe creation technology for the production lines without the sample preparation and the manual operation using RD applied in Sony Semiconductor Kyusyu Corporation Kumamoto Technology Center (SCK Corporation Kumamoto TEC).

  11. Automation System Goals for the Creation and Operation of the Tool

    Science.gov (United States)

    Khisamutdinov, R. M.; Khisamutdinov, M. R.

    2014-12-01

    Complex automation of processes for creation and operating the instrument, consistent linking of hierarchical levels in the single system of collection and processing of data and operations management, integration with TEAMCENTRE PLM and SAP/R3 ERP significantly improve the quality and efficiency of production preparation.

  12. Automation for pattern library creation and in-design optimization

    Science.gov (United States)

    Deng, Rock; Zou, Elain; Hong, Sid; Wang, Jinyan; Zhang, Yifan; Sweis, Jason; Lai, Ya-Chieh; Ding, Hua; Huang, Jason

    2015-03-01

    Semiconductor manufacturing technologies are becoming increasingly complex with every passing node. Newer technology nodes are pushing the limits of optical lithography and requiring multiple exposures with exotic material stacks for each critical layer. All of this added complexity usually amounts to further restrictions in what can be designed. Furthermore, the designs must be checked against all these restrictions in verification and sign-off stages. Design rules are intended to capture all the manufacturing limitations such that yield can be maximized for any given design adhering to all the rules. Most manufacturing steps employ some sort of model based simulation which characterizes the behavior of each step. The lithography models play a very big part of the overall yield and design restrictions in patterning. However, lithography models are not practical to run during design creation due to their slow and prohibitive run times. Furthermore, the models are not usually given to foundry customers because of the confidential and sensitive nature of every foundry's processes. The design layout locations where a model flags unacceptable simulated results can be used to define pattern rules which can be shared with customers. With advanced technology nodes we see a large growth of pattern based rules. This is due to the fact that pattern matching is very fast and the rules themselves can be very complex to describe in a standard DRC language. Therefore, the patterns are left as either pattern layout clips or abstracted into pattern-like syntax which a pattern matcher can use directly. The patterns themselves can be multi-layered with "fuzzy" designations such that groups of similar patterns can be found using one description. The pattern matcher is often integrated with a DRC tool such that verification and signoff can be done in one step. The patterns can be layout constructs that are "forbidden", "waived", or simply low-yielding in nature. The patterns can also

  13. Achieving mask order processing automation, interoperability and standardization based on P10

    Science.gov (United States)

    Rodriguez, B.; Filies, O.; Sadran, D.; Tissier, Michel; Albin, D.; Stavroulakis, S.; Voyiatzis, E.

    2007-02-01

    Last year the MUSCLE (Masks through User's Supply Chain: Leadership by Excellence) project was presented. Here is the project advancement. A key process in mask supply chain management is the exchange of technical information for ordering masks. This process is large, complex, company specific and error prone, and leads to longer cycle times and higher costs due to missing or wrong inputs. Its automation and standardization could produce significant benefits. We need to agree on the standard for mandatory and optional parameters, and also a common way to describe parameters when ordering. A system was created to improve the performance in terms of Key Performance Indicators (KPIs) such as cycle time and cost of production. This tool allows us to evaluate and measure the effect of factors, as well as the effect of implementing the improvements of the complete project. Next, a benchmark study and a gap analysis were performed. These studies show the feasibility of standardization, as there is a large overlap in requirements. We see that the SEMI P10 standard needs enhancements. A format supporting the standard is required, and XML offers the ability to describe P10 in a flexible way. Beyond using XML for P10, the semantics of the mask order should also be addressed. A system design and requirements for a reference implementation for a P10 based management system are presented, covering a mechanism for the evolution and for version management and a design for P10 editing and data validation.

  14. Practical Implementation of Semi-Automated As-Built Bim Creation for Complex Indoor Environments

    Science.gov (United States)

    Yoon, S.; Jung, J.; Heo, J.

    2015-05-01

    In recent days, for efficient management and operation of existing buildings, the importance of as-built BIM is emphasized in AEC/FM domain. However, fully automated as-built BIM creation is a tough issue since newly-constructed buildings are becoming more complex. To manage this problem, our research group has developed a semi-automated approach, focusing on productive 3D as-built BIM creation for complex indoor environments. In order to test its feasibility for a variety of complex indoor environments, we applied the developed approach to model the `Charlotte stairs' in Lotte World Mall, Korea. The approach includes 4 main phases: data acquisition, data pre-processing, geometric drawing, and as-built BIM creation. In the data acquisition phase, due to its complex structure, we moved the scanner location several times to obtain the entire point clouds of the test site. After which, data pre-processing phase entailing point-cloud registration, noise removal, and coordinate transformation was followed. The 3D geometric drawing was created using the RANSAC-based plane detection and boundary tracing methods. Finally, in order to create a semantically-rich BIM, the geometric drawing was imported into the commercial BIM software. The final as-built BIM confirmed that the feasibility of the proposed approach in the complex indoor environment.

  15. METHODOLOGICAL PROBLEMS AND WAYS OF CREATION OF THE AIRCRAFT EQUIPMENT TEST AUTOMATED MANAGEMENT SYSTEM

    Directory of Open Access Journals (Sweden)

    Vladimir Michailovich Vetoshkin

    2017-01-01

    Full Text Available The development of new and modernization of existing aviation equipment specimens of different classes are ac- companied and completed by the complex process of ground and flight tests. This phase of aviation equipment life cycle is implemented by means of organizational and technical systems - running centers. The latter include various proving grounds, measuring complex and systems, aircraft, ships, security and flight control offices, information processing laborato- ries and many other elements. The system analysis results of development challenges of the automated control systems of aviation equipment tests operations are presented. The automated control systems are in essence an automated data bank. The key role of development of flight tests automated control system in the process of creation of the automated control sys- tems of aviation equipment tests operations is substantiated. The way of the mobile modular measuring complexes integra- tion and the need for national methodologies and technological standards for database systems design concepts are grounded. Database system, as a central element in this scheme, provides collection, storing and updating of values of the elements described above in pace and the required frequency of the controlled object state monitoring. It is database system that pro- vides the supervisory unit with actual data corresponding to specific moments of time, which concern the state processes, assessments of the progress and results of flight experiments, creating the necessary environment for aviation equipment managing and testing as a whole. The basis for development of subsystems of automated control systems of aviation equip- ment tests operations are conceptual design processes of the respective database system, the implementation effectiveness of which largely determines the level of success and ability to develop the systems being created. Introduced conclusions and suggestions can be used in the

  16. Research study: Device technology STAR router user's guide. [automated layout of large scale integration discretionary interconnection masks

    Science.gov (United States)

    Wright, R. A.

    1979-01-01

    The STAR Router program developed to perform automated layout of LSI discretionary interconnection masks is described. The input and output for the router are standard PR2D data files. A state-of-the-art cellular path-finding procedure, based on Lee's algorithm, which produces fast, shortest distance routing of microcircuit net data is included.

  17. Image processing and pattern recognition with CVIPtools MATLAB toolbox: automatic creation of masks for veterinary thermographic images

    Science.gov (United States)

    Mishra, Deependra K.; Umbaugh, Scott E.; Lama, Norsang; Dahal, Rohini; Marino, Dominic J.; Sackman, Joseph

    2016-09-01

    CVIPtools is a software package for the exploration of computer vision and image processing developed in the Computer Vision and Image Processing Laboratory at Southern Illinois University Edwardsville. CVIPtools is available in three variants - a) CVIPtools Graphical User Interface, b) CVIPtools C library and c) CVIPtools MATLAB toolbox, which makes it accessible to a variety of different users. It offers students, faculty, researchers and any user a free and easy way to explore computer vision and image processing techniques. Many functions have been implemented and are updated on a regular basis, the library has reached a level of sophistication that makes it suitable for both educational and research purposes. In this paper, the detail list of the functions available in the CVIPtools MATLAB toolbox are presented and how these functions can be used in image analysis and computer vision applications. The CVIPtools MATLAB toolbox allows the user to gain practical experience to better understand underlying theoretical problems in image processing and pattern recognition. As an example application, the algorithm for the automatic creation of masks for veterinary thermographic images is presented.

  18. Blending Education and Polymer Science: Semi Automated Creation of a Thermodynamic Property Database.

    Science.gov (United States)

    Tchoua, Roselyne B; Qin, Jian; Audus, Debra J; Chard, Kyle; Foster, Ian T; de Pablo, Juan

    2016-09-13

    Structured databases of chemical and physical properties play a central role in the everyday research activities of scientists and engineers. In materials science, researchers and engineers turn to these databases to quickly query, compare, and aggregate various properties, thereby allowing for the development or application of new materials. The vast majority of these databases have been generated manually, through decades of labor-intensive harvesting of information from the literature; yet, while there are many examples of commonly used databases, a significant number of important properties remain locked within the tables, figures, and text of publications. The question addressed in our work is whether, and to what extent, the process of data collection can be automated. Students of the physical sciences and engineering are often confronted with the challenge of finding and applying property data from the literature, and a central aspect of their education is to develop the critical skills needed to identify such data and discern their meaning or validity. To address shortcomings associated with automated information extraction, while simultaneously preparing the next generation of scientists for their future endeavors, we developed a novel course-based approach in which students develop skills in polymer chemistry and physics and apply their knowledge by assisting with the semi-automated creation of a thermodynamic property database.

  19. Automated Segmentation of Cerebellum Using Brain Mask and Partial Volume Estimation Map

    Directory of Open Access Journals (Sweden)

    Dong-Kyun Lee

    2015-01-01

    Full Text Available While segmentation of the cerebellum is an indispensable step in many studies, its contrast is not clear because of the adjacent cerebrospinal fluid, meninges, and cerebra peduncle. Thus, various cerebellar segmentation methods, such as a deformable model or a template-based algorithm might exhibit incorrect segmentation of the venous sinuses and the cerebellar peduncle. In this study, we propose a fully automated procedure combining cerebellar tissue classification, a template-based approach, and morphological operations sequentially. The cerebellar region was defined approximately by removing the cerebral region from the brain mask. Then, the noncerebellar region was trimmed using a morphological operator and the brain-stem atlas was aligned to the individual brain to define the brain-stem area. The proposed method was validated with the well-known FreeSurfer and ITK-SNAP packages using the dice similarity index and recall and precision scores. As a result, the proposed method was significantly better than the other methods for the dice similarity index (0.93, FreeSurfer: 0.92, ITK-SNAP: 0.87 and precision (0.95, FreeSurfer: 0.90, ITK-SNAP: 0.93. Therefore, it could be said that the proposed method yielded a robust and accurate segmentation result. Moreover, additional postprocessing with the brain-stem atlas could improve its result.

  20. An Enhanced Automated Test Item Creation Based on Learners Preferred Concept Space

    Directory of Open Access Journals (Sweden)

    Mohammad AL-Smadi

    2016-03-01

    Full Text Available Recently, research has become increasingly inter-ested in developing tools that are able to automatically create test items out of text-based learning contents. Such tools might not only support instructors in creating tests or exams but also learners in self-assessing their learning progress. This paper presents an enhanced automatic question-creation tool (EAQC that has been recently developed. EAQC extracts the most important key phrases (concepts out of a textual learning content and automatically creates test items based on these concepts. Moreover, this paper discusses two studies for the evaluation of EAQC application in real learning settings. The first study showed that concepts extracted by the EAQC often but not always reflect the concepts extracted by learners. Learners typically extracted fewer concepts than the EAQC and there was a great inter-individual variation between learners with regard to which concepts they experienced as relevant. Accordingly, the second study investigated whether the functionality of the EAQC can be improved in a way that valid test items are created if the tool was fed with concepts provided by learners. The results showed that the quality of semi-automated creation of test items were satisfactory. Moreover, this depicts the EAQC flexibility in adapting its workflow to the individual needs of the learners.

  1. Assessing breast cancer masking risk with automated texture analysis in full field digital mammography

    DEFF Research Database (Denmark)

    Kallenberg, Michiel Gijsbertus J; Lillholm, Martin; Diao, Pengfei

    2015-01-01

    status in a five-fold cross validation. To assess the interaction of the texture scores with breast density, Volpara Density Grade (VDG) was determined for each image using Volpara, Matakina Technology, New Zealand. RESULTS We grouped women into low (VDG 1/2) versus high (VDG 3/4) dense, and low...... for the high texture score group (as compared to the low texture score group) this OR was 2.19 (1.37-3.49). Women who were classified as low dense but had a high texture score had a higher masking risk (OR 1.66 (0.53-5.20)) than women with dense breasts but a low texture score. CONCLUSION Mammographic texture...... is associated with breast cancer masking risk. We were able to identify a subgroup of women who are at an increased risk of having a cancer that is not detected due to textural masking, even though their breasts are non-dense. CLINICAL RELEVANCE/APPLICATION Automatic texture analysis enables assessing the risk...

  2. Grayscale lithography-automated mask generation for complex three-dimensional topography

    Science.gov (United States)

    Loomis, James; Ratnayake, Dilan; McKenna, Curtis; Walsh, Kevin M.

    2016-01-01

    Grayscale lithography is a relatively underutilized technique that enables fabrication of three-dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially modulating ultraviolet (UV) dosage during the writing process, one can vary the depth at which photoresist is developed. This means complex structures and bioinspired designs can readily be produced that would otherwise be cost prohibitive or too time intensive to fabricate. The main barrier to widespread grayscale implementation, however, stems from the laborious generation of mask files required to create complex surface topography. We present a process and associated software utility for automatically generating grayscale mask files from 3-D models created within industry-standard computer-aided design (CAD) suites. By shifting the microelectromechanical systems (MEMS) design onus to commonly used CAD programs ideal for complex surfacing, engineering professionals already familiar with traditional 3-D CAD software can readily utilize their pre-existing skills to make valuable contributions to the MEMS community. Our conversion process is demonstrated by prototyping several samples on a laser pattern generator-capital equipment already in use in many foundries. Finally, an empirical calibration technique is shown that compensates for nonlinear relationships between UV exposure intensity and photoresist development depth as well as a thermal reflow technique to help smooth microstructure surfaces.

  3. Assessing breast cancer masking risk in full field digital mammography with automated texture analysis

    DEFF Research Database (Denmark)

    Kallenberg, Michiel Gijsbertus J; Lillholm, Martin; Diao, Pengfei

    2015-01-01

    Purpose: The goal of this work is to develop a method to assess the risk of breast cancer masking, based on image characteristics beyond breast density. Method: From the Dutch breast cancer screening program we collected 285 screen detected cancers, and 109 cancers that were screen negative...... and subsequently appeared as interval cancers. To obtain mammograms without cancerous tissue, we took the contralateral mammograms. We developed a novel machine learning based method called convolutional sparse autoencoder to characterize mammographic texture. The method was trained and tested on raw mammograms...... to determine cancer detection status in a five-fold cross validation. To assess the interaction of the texture scores with breast density, Volpara Density Grade was determined for each image. Results: We grouped women into low (VDG 1/2) versus high (VDG 3/4) dense, and low (Quartile 1/2) versus high (Q 3...

  4. Automated Metadata in Multimedia Information Systems Creation, Refinement, Use in Surrogates, and Evaluation

    CERN Document Server

    Christel, Michael

    2009-01-01

    Improvements in network bandwidth along with dramatic drops in digital storage and processing costs have resulted in the explosive growth of multimedia (combinations of text, image, audio, and video) resources on the Internet and in digital repositories. A suite of computer technologies delivering speech, image, and natural language understanding can automatically derive descriptive metadata for such resources. Difficulties for end users ensue, however, with the tremendous volume and varying quality of automated metadata for multimedia information systems. This lecture surveys automatic metada

  5. THE AUTOMATED SYSTEM OF RADIATION EXPOSURE CONTROL (ASCRE FOR ROSPOTREBNADZOR: CREATION HISTORY, APPLICABILITY AND DEVELOPMENT

    Directory of Open Access Journals (Sweden)

    L. V. Repin

    2014-01-01

    Full Text Available The article describes the automated system of radiation exposure control (ASCRE for Rospotrebnadzor developed  in  the  framework  of  the  Federal  target  program  "Nuclear  and  Radiation  Safety  in  2008  and  for  the period till 2015". The history of the development of this system is given. It is shown the diagram of the functioning of ASCRE, description of the individual blocks of diagram is given. It is shown that the grpouping of the data from various Federal banks in the single automated information-analytical system on the general address basis with the wide possibilities of analytical tools application will greatly expand the range of the issues for the assessment of radiation impact on the population than in the existing systems. The use of automation resources will reduce the time for obtaining the necessary information and, ultimately, will increase the effectiveness of the decision making in the field of radiation protection.

  6. THE AUTOMATED SYSTEM OF RADIATION EXPOSURE CONTROL (ASCRE) FOR ROSPOTREBNADZOR: CREATION HISTORY, APPLICABILITY AND DEVELOPMENT

    OpenAIRE

    L. V. Repin; A. M. Biblin; P. G. Kovalev; M. S. Nikolaevich; V. S. Repin

    2014-01-01

    The article describes the automated system of radiation exposure control (ASCRE) for Rospotrebnadzor developed  in  the  framework  of  the  Federal  target  program  "Nuclear  and  Radiation  Safety  in  2008  and  for  the period till 2015". The history of the development of this system is given. It is shown the diagram of the functioning of ASCRE, description of the individual blocks of diagram is given. It is shown that the grpouping of the data from various Federal banks in the single au...

  7. CADAT integrated circuit mask analysis

    Science.gov (United States)

    1981-01-01

    CADAT System Mask Analysis Program (MAPS2) is automated software tool for analyzing integrated-circuit mask design. Included in MAPS2 functions are artwork verification, device identification, nodal analysis, capacitance calculation, and logic equation generation.

  8. Recipe creation for automated defect classification with a 450mm surface scanning inspection system based on the bidirectional reflectance distribution function of native defects

    Science.gov (United States)

    Yathapu, Nithin; McGarvey, Steve; Brown, Justin; Zhivotovsky, Alexander

    2016-03-01

    This study explores the feasibility of Automated Defect Classification (ADC) with a Surface Scanning Inspection System (SSIS). The defect classification was based upon scattering sensitivity sizing curves created via modeling of the Bidirectional Reflectance Distribution Function (BRDF). The BRDF allowed for the creation of SSIS sensitivity/sizing curves based upon the optical properties of both the filmed wafer samples and the optical architecture of the SSIS. The elimination of Polystyrene Latex Sphere (PSL) and Silica deposition on both filmed and bare Silicon wafers prior to SSIS recipe creation and ADC creates a challenge for light scattering surface intensity based defect binning. This study explored the theoretical maximal SSIS sensitivity based on native defect recipe creation in conjunction with the maximal sensitivity derived from BRDF modeling recipe creation. Single film and film stack wafers were inspected with recipes based upon BRDF modeling. Following SSIS recipe creation, initially targeting maximal sensitivity, selected recipes were optimized to classify defects commonly found on non-patterned wafers. The results were utilized to determine the ADC binning accuracy of the native defects and evaluate the SSIS recipe creation methodology. A statistically valid sample of defects from the final inspection results of each SSIS recipe and filmed substrate were reviewed post SSIS ADC processing on a Defect Review Scanning Electron Microscope (SEM). Native defect images were collected from each statistically valid defect bin category/size for SEM Review. The data collected from the Defect Review SEM was utilized to determine the statistical purity and accuracy of each SSIS defect classification bin. This paper explores both, commercial and technical, considerations of the elimination of PSL and Silica deposition as a precursor to SSIS recipe creation targeted towards ADC. Successful integration of SSIS ADC in conjunction with recipes created via BRDF

  9. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  10. Semi-Automated Creation of Converged iTV Services: From Macromedia Director Simulations to Services Ready for Broadcast

    Directory of Open Access Journals (Sweden)

    Emmanuel Tsekleves

    2007-07-01

    Full Text Available While sound and video may capture viewers′ attention, interaction can captivate them. This has not been available prior to the advent of Digital Television. In fact, what lies at the heart of the Digital Television revolution is this new type of interactive content, offered in the form of interactive Television (iTV services.On top of that, the new world of converged networks has created a demand for a new type of converged services on a range of mobile terminals (Tablet PCs, PDAs and mobile phones. This paper aims at presenting a new approach to service creation that allows for the semi-automatic translation of simulations and rapid prototypes created in the accessible desktop multimedia authoring package Macromedia Director into services ready for broadcast. This is achieved by a series of tools that de-skill and speed-up the process of creating digital TV user interfaces (UI and applications for mobile terminals.The benefits of rapid prototyping are essential for the production of these new types of services, and are therefore discussed in the first section of this paper. In the following sections, an overview of the operation of content, service, creation and management sub-systems is presented, which illustrates why these tools compose an important and integral part of a system responsible of creating, delivering and managing converged broadcast and telecommunications services. The next section examines a number of metadata languages candidates for describing the iTV services user interface and the schema language adopted in this project. A detailed description of the operation of the two tools is provided to offer an insight of how they can be used to de-skill and speed-up the process of creating digital TV user interfaces and applications for mobile terminals. Finally, representative broadcast oriented and telecommunication oriented converged service components are also introduced, demonstrating how these tools have been used to

  11. Overview of Mask Metrology

    Science.gov (United States)

    Rice, Bryan J.; Jindal, Vibhu; Lin, C. C.; Harris-Jones, Jenah; Kwon, Hyuk Joo; Ma, Hsing-Chien; Goldstein, Michael; Chan, Yau-Wai; Goodwin, Frank

    2011-11-01

    Extreme ultraviolet (EUV) lithography is the successor to optical lithography and will enable advanced patterning in semiconductor manufacturing processes down to the 8 nm half pitch technology node and beyond. However, before EUV can successfully be inserted into high volume manufacturing a few challenges must be overcome. Central among these remaining challenges is the requirement to produce "defect free" EUV masks. Mask blank defects have been one of the top challenges in the commercialization of extreme ultraviolet (EUV) lithography. To determine defect sources and devise mitigation solutions, detailed characterization of defects is critical. However, small defects pose challenges in metrology scale-up. SEMATECH has a comprehensive metrology strategy to address any defect larger than a 20 nm core size to obtain solutions for defect-free EUV mask blanks. SEMATECH's Mask Blank Development Center has been working since 2003 to develop the technology to support defect free EUV mask blanks. Since 2003, EUV mask blank defects have been reduced from 10000 of size greater than 100 nm to about a few tens at size 70 nm. Unfortunately, today's state of the art defect levels are still about 10 to 100 times higher than needed. Closing this gap requires progress in the various processes associated with glass substrate creation and multilayer deposition. That process development improvement in turn relies upon the availability of metrology equipment that can resolve and chemically characterize defects as small as 30 nm. The current defect reduction efforts at SEMATECH have intensively included a focus on inspection and characterization. The facility boasts nearly 100M of metrology hardware, including an FEI Titan TEM, Lasertec M1350 and M7360 tools, an actinic inspection tool, AFM, SPM, and scanning auger capabilities. The newly established Auger tool at SEMATECH can run a standard 6-inch mask blank and is already providing important information on sub-100 nm defects on EUV

  12. EST2uni: an open, parallel tool for automated EST analysis and database creation, with a data mining web interface and microarray expression data integration

    Directory of Open Access Journals (Sweden)

    Nuez Fernando

    2008-01-01

    Full Text Available Abstract Background Expressed sequence tag (EST collections are composed of a high number of single-pass, redundant, partial sequences, which need to be processed, clustered, and annotated to remove low-quality and vector regions, eliminate redundancy and sequencing errors, and provide biologically relevant information. In order to provide a suitable way of performing the different steps in the analysis of the ESTs, flexible computation pipelines adapted to the local needs of specific EST projects have to be developed. Furthermore, EST collections must be stored in highly structured relational databases available to researchers through user-friendly interfaces which allow efficient and complex data mining, thus offering maximum capabilities for their full exploitation. Results We have created EST2uni, an integrated, highly-configurable EST analysis pipeline and data mining software package that automates the pre-processing, clustering, annotation, database creation, and data mining of EST collections. The pipeline uses standard EST analysis tools and the software has a modular design to facilitate the addition of new analytical methods and their configuration. Currently implemented analyses include functional and structural annotation, SNP and microsatellite discovery, integration of previously known genetic marker data and gene expression results, and assistance in cDNA microarray design. It can be run in parallel in a PC cluster in order to reduce the time necessary for the analysis. It also creates a web site linked to the database, showing collection statistics, with complex query capabilities and tools for data mining and retrieval. Conclusion The software package presented here provides an efficient and complete bioinformatics tool for the management of EST collections which is very easy to adapt to the local needs of different EST projects. The code is freely available under the GPL license and can be obtained at http

  13. Creation, Identity and Reflection

    Directory of Open Access Journals (Sweden)

    Alina Beatrice Cheşcă

    2015-05-01

    Full Text Available The paper “Creation, Identity and Reflection” approaches the identification in the “mirror” of reality with creation, in other words seeking the authors’ identity in the reflected images. Reflection means attempting to find oneself, the mirror being the main principle of creation. Many characters become interesting only when they step into the world beyond the mirror, when their faces are doubled by the other self or when their selves are returned by other characters. The narcissistic concept of the mirror, i.e. the reflection in the mirror and the representation of the mirror itself, is a recurrent one in literature, but the reflection of the self which is not the self (as it is a reflection does not necessarily appear in a mirror or in a photograph or portrait. Sometimes, the not-self is returned to the self by another person or character. As far as Oscar Wilde’s theories are concerned, the main idea is that people are interesting for their masks, not for their inner nature. What Wilde calls “inner nature” is the characters’ un-reflected self and the mask is the reflection, the self in the mirror. Some characters’ relationships develop within a fiction that they dramatically try to preserve and protect with the risk of suffering. They refuse to take off the masks which define them in the others’ minds and hearts; the narcissistic individuals (both artists and characters seek and love their own image which they project upon facts, thus creating a fictive realm.

  14. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  15. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  16. Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

    Science.gov (United States)

    Liebmann, Lars W.; Graur, Ioana C.; Leipold, William C.; Oberschmidt, James M.; O'Grady, David S.; Regaill, Denis

    1999-07-01

    While the benefits of alternating phase shifted masks in improving lithographic process windows at increased resolution are well known throughout the lithography community, broad implementation of this potentially powerful technique has been slow due to the inherent complexity of the layout design and mask manufacturing process. This paper will review a project undertaken at IBM's Semiconductor Research and Development Center and Mask Manufacturing and Development facility to understand the technical and logistical issues associated with the application of alternating phase shifted mask technology to the gate level of a full microprocessor chip. The work presented here depicts an important milestone toward integration of alternating phase shifted masks into the manufacturing process by demonstrating an automated design solution and yielding a functional alternating phase shifted mask. The design conversion of the microprocessor gate level to a conjugate twin shifter alternating phase shift layout was accomplished with IBM's internal design system that automatically scaled the design, added required phase regions, and resolved phase conflicts. The subsequent fabrication of a nearly defect free phase shifted mask, as verified by SEM based die to die inspection, highlights the maturity of the alternating phase shifted mask manufacturing process in IBM's internal mask facility. Well defined and recognized challenges in mask inspection and repair remain and the layout of alternating phase shifted masks present a design and data preparation overhead, but the data presented here demonstrate the feasibility of designing and building manufacturing quality alternating phase shifted masks for the gate level of a microprocessor.

  17. Path Creation

    DEFF Research Database (Denmark)

    Karnøe, Peter; Garud, Raghu

    2012-01-01

    This paper employs path creation as a lens to follow the emergence of the Danish wind turbine cluster. Supplier competencies, regulations, user preferences and a market for wind power did not pre-exist; all had to emerge in a tranformative manner involving multiple actors and artefacts. Competenc......This paper employs path creation as a lens to follow the emergence of the Danish wind turbine cluster. Supplier competencies, regulations, user preferences and a market for wind power did not pre-exist; all had to emerge in a tranformative manner involving multiple actors and artefacts....... Competencies emerged through processes and mechanisms such as co-creation that implicated multiple learning processes. The process was not an orderly linear one as emergent contingencies influenced the learning processes. An implication is that public policy to catalyse clusters cannot be based...

  18. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  19. Entropic Creation

    DEFF Research Database (Denmark)

    Kragh, Helge

    Entropic Creation is the first English-language book to consider the cultural and religious responses to the second law of thermodynamics, from around 1860 to 1920. According to the second law of thermodynamics, as formulated by the German physicist Rudolf Clausius, the entropy of any closed system...... the physicist William Thomson and the communist thinker Friedrich Engels. One reason for the passion of the debate was that some authors used the law of entropy increase to argue for a divine creation of the world. Consequently, the second law of thermodynamics became highly controversial. In Germany...... will inevitably increase in time, meaning that the system will decay and eventually end in a dead state of equilibrium. Application of the law to the entire universe, first proposed in the 1850s, led to the prediction of a future 'heat death', where all life has ceased and all organization dissolved. In the late...

  20. A semi-automated tool for reducing the creation of false closed depressions from a filled LIDAR-derived digital elevation model

    Science.gov (United States)

    Waller, John S.; Doctor, Daniel H.; Terziotti, Silvia

    2015-01-01

    Closed depressions on the land surface can be identified by ‘filling’ a digital elevation model (DEM) and subtracting the filled model from the original DEM. However, automated methods suffer from artificial ‘dams’ where surface streams cross under bridges and through culverts. Removal of these false depressions from an elevation model is difficult due to the lack of bridge and culvert inventories; thus, another method is needed to breach these artificial dams. Here, we present a semi-automated workflow and toolbox to remove falsely detected closed depressions created by artificial dams in a DEM. The approach finds the intersections between transportation routes (e.g., roads) and streams, and then lowers the elevation surface across the roads to stream level allowing flow to be routed under the road. Once the surface is corrected to match the approximate location of the National Hydrologic Dataset stream lines, the procedure is repeated with sequentially smaller flow accumulation thresholds in order to generate stream lines with less contributing area within the watershed. Through multiple iterations, artificial depressions that may arise due to ephemeral flow paths can also be removed. Preliminary results reveal that this new technique provides significant improvements for flow routing across a DEM and minimizes artifacts within the elevation surface. Slight changes in the stream flow lines generally improve the quality of flow routes; however some artificial dams may persist. Problematic areas include extensive road ditches, particularly along divided highways, and where surface flow crosses beneath road intersections. Limitations do exist, and the results partially depend on the quality of data being input. Of 166 manually identified culverts from a previous study by Doctor and Young in 2013, 125 are within 25 m of culverts identified by this tool. After three iterations, 1,735 culverts were identified and cataloged. The result is a reconditioned

  1. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  2. Mask degradation monitoring with aerial mask inspector

    Science.gov (United States)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  3. Mask industry assessment: 2004

    Science.gov (United States)

    Shelden, Gilbert V.; Hector, Scott D.

    2004-12-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the third in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey builds upon the 2003 survey to provide an ongoing database using the same questions as a baseline with only a few minor changes or additions. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from ten major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

  4. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  5. Analyzing EUV mask costs

    Science.gov (United States)

    Lercel, Michael; Kasprowicz, Bryan

    2016-10-01

    The introduction of Extreme Ultraviolet Lithography (EUV) as a replacement for multiple patterning is based on improvements of cycle time, yield, and cost. Earlier cost studies have assumed a simple assumption that EUV masks (being more complex with the multilayer coated blank) are not more than three times as expensive as advanced ArFi (ArF immersion) masks. EUV masks are expected to be more expensive during the ramp of the technology because of the added cost of the complex mask blank, the use of EUV specific mask tools, and a ramp of yield learning relative to the more mature technologies. This study concludes that, within a range of scenarios, the hypothesis that EUV mask costs are not more than three times that of advanced ArFi masks is valid and conservative.

  6. Polymer Masks for nanostructuring of graphene

    DEFF Research Database (Denmark)

    Shvets, Violetta

    This PhD project is a part of Center for Nanostructured Graphene (CNG) activities. The aim of the project is to develop a new lithography method for creation of highly ordered nanostructures with as small as possible feature and period sizes. The method should be applicable for graphene...... polymer masks is developed. Mask fabrication is realized by microtoming of 30-60 nm thin sections from pre-aligned polymer monoliths with different morphologies. The resulting polymer masks are then transferred to both silicon and graphene substrates. Hexagonally packed hole patterns with 10 nm hole...... diameter and 20 nm periodicity are successfully transferred to both substrates. The method allowed to realize the first ever transfer of moiré patterns to silicon. Furthermore, in collaboration with CNG, device with nanostructured graphene are fabricated and electrical measurements made on these devices...

  7. Dockomatic - automated ligand creation and docking

    OpenAIRE

    Hampikian Greg; McDougal Owen M; Jacob Reed B; Bullock Casey W; Andersen Tim

    2010-01-01

    Abstract Background The application of computational modeling to rationally design drugs and characterize macro biomolecular receptors has proven increasingly useful due to the accessibility of computing clusters and clouds. AutoDock is a well-known and powerful software program used to model ligand to receptor binding interactions. In its current version, AutoDock requires significant amounts of user time to setup and run jobs, and collect results. This paper presents DockoMatic, a user frie...

  8. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime...... mask using a directional system and a method for correcting errors in the target binary mask. The last part of the thesis, proposes a new method for objective evaluation of speech intelligibility....

  9. Mask industry assessment: 2003

    Science.gov (United States)

    Kimmel, Kurt R.

    2003-12-01

    Microelectronics industry leaders routinely name mask technology and mask supply issues of cost and cycle time as top issues of concern. A survey was initiated in 2002 with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition.1 This paper presents the results of the second annual survey which is an enhanced version of the inaugural survey building upon its strengths and improving the weak points. The original survey was designed with the input of member company mask technologists, merchant mask suppliers, and industry equipment makers. The assessment is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the critical mask industry. An objective is to create a valuable reference to identify strengths and opportunities and to guide investments on critical-path issues. As subsequent years are added, historical profiles can also be created. This assessment includes inputs from ten major global merchant and captive mask manufacturers representing approximately 80% of the global mask market (using revenue as the measure) and making this the most comprehensive mask industry survey ever. The participating companies are: Compugraphics, Dai Nippon Printing, Dupont Photomask, Hoya, IBM, Infineon, Intel, Taiwan Mask Company, Toppan, and TSMC. Questions are grouped into five categories: General Business Profile Information; Data Processing; Yields and Yield loss Mechanisms; Delivery Time; and Returns and Services. Within each category are a multitude of questions that create a detailed profile of both the business and technical status of the mask industry.

  10. Binary mask programmable hologram.

    Science.gov (United States)

    Tsang, P W M; Poon, T-C; Zhou, Changhe; Cheung, K W K

    2012-11-19

    We report, for the first time, the concept and generation of a novel Fresnel hologram called the digital binary mask programmable hologram (BMPH). A BMPH is comprised of a static, high resolution binary grating that is overlaid with a lower resolution binary mask. The reconstructed image of the BMPH can be programmed to approximate a target image (including both intensity and depth information) by configuring the pattern of the binary mask with a simple genetic algorithm (SGA). As the low resolution binary mask can be realized with less stringent display technology, our method enables the development of simple and economical holographic video display.

  11. Mask design rules (45 nm): time for standardization

    Science.gov (United States)

    Mason, Mark; Progler, Christopher J.; Martin, Patrick; Ham, Young-Mog; Dillon, Brian; Pack, Robert; Heins, Mitch; Gookassian, John; Garcia, John; Boksha, Victor

    2005-11-01

    compounds. Furthermore, it will be necessary to comprehend certain MRC restrictions in the design flow as well as in the RET and MDP space. While mask tool manufacturers will need to be able specify tools specifications relevant to the MRCs for a particular mask shop flow, software tool suppliers, such as for RET, need to do so as well with tools which comprehend, check for, and enforce MRCs consistently. IDMs, foundaries, mask shops, EDA companies and tool suppliers will need a common language for the discussion on MaskDRs and MRCs in order to reach unambiguous convergence. Experience at Texas Instruments shows that accurate description, specification, and interpretation of MaskDRs and applying the associated MRCs is critical to a successful advanced mask technology strategy. This paper proposes the creation of a standard MaskDR lexicon. The goal of such a lexicon is the standardization of MaskDRs and their definitions such that interested parties from various mask-related disciplines can discuss, negotiate, specify, test and enforce MaskDRs unambiguously. We further propose that this standard be machine readable and directly usable without the necessity for intermediate interpretations. This lexicon would allow the designers, IDMs, foundaries, mask suppliers, and equipment suppliers to unambiguously negotiate and agree upon mask manufacturability requirements for their particular application.

  12. Mask industry assessment: 2005

    Science.gov (United States)

    Shelden, Gilbert; Hector, Scott

    2005-11-01

    Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. A survey was created with support from International SEMATECH (ISMT) and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of equipment for mask fabrication. This year's assessment is the fourth in the current series of annual reports and is intended to be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. This report will continue to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results may be used to guide future investments on critical path issues. This year's survey contains all of the 2004 survey questions to provide an ongoing database. Additional questions were added to the survey covering operating cost factors and equipment utilization. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors and equipment utilization. Within each category are a many questions that create a detailed profile of both the business and technical status of the mask industry. This assessment includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market. This participation rate is reduced by one captive from 2004. Note: Toppan, DuPont Photomasks Inc and AMTC (new) were consolidated into one input therefore the 2004 and 2005 surveys are basically equivalent.

  13. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  14. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  15. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  16. A Fully Automated Penumbra Segmentation Tool

    DEFF Research Database (Denmark)

    Nagenthiraja, Kartheeban; Ribe, Lars Riisgaard; Hougaard, Kristina Dupont

    2012-01-01

    salavageable tissue, quickly and accurately. We present a fully Automated Penumbra Segmentation (APS) algorithm using PWI and DWI images. We compare automatically generated PWI-DWI mismatch mask to mask outlined manually by experts, in 168 patients. Method: The algorithm initially identifies PWI lesions...

  17. Gilded Silver Mask

    Institute of Scientific and Technical Information of China (English)

    1998-01-01

    This gilded silver mask from the Liao Dynasty is 31 cm long and 22.2 cm wide. The plump oval face was designed with a protruding brow ridge, narrow eyes, high-bridged nose and closed mouth. The chin is slightly round against a thin neck, the ears are long and the hair can be clearly seen from the finely carved lines. The use of masks was recorded as

  18. New mask technology challenges

    Science.gov (United States)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  19. New method of contour-based mask-shape compiler

    Science.gov (United States)

    Matsuoka, Ryoichi; Sugiyama, Akiyuki; Onizawa, Akira; Sato, Hidetoshi; Toyoda, Yasutaka

    2007-10-01

    We have developed a new method of accurately profiling a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, it is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method for a DFM solution in which two dimensional data are extracted for an error free practical simulation by precise reproduction of a real mask shape in addition to the mask data simulation. The flow centering around the design data is fully automated and provides an environment where optimization and verification for fully automated model calibration with much less error is available. It also allows complete consolidation of input and output functions with an EDA system by constructing a design data oriented system structure. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

  20. Mask Blank Defect Detection

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask

  1. Co-Creation

    DEFF Research Database (Denmark)

    Degnegaard, Rex

    2012-01-01

    Co-creation as a concept has won terrain over the past 10 years. In practice as well as in literature, co-creation is climbing the agenda in relation to contemporary opportunities and challenges within management, organization development, and change initiatives. However, there Is very little...... research-based literature on the development of co-creation. This paper aims to build an overview of the literature on co-creation to explore what the existing literature relate to and indeed to pinpoint if any pattern or streams can be identified. A main finding from the analysis is how co-creation tends...

  2. Co-Creation

    DEFF Research Database (Denmark)

    Degnegaard, Rex

    Co-creation as a concept has won terrain over the past 10 years. In practice as well as in literature, co-creation is climbing the agenda in relation to contemporary opportunities and challenges within management, organization development, and change initiatives. However, there Is very little...... research-based literature on the development of co-creation. This paper aims to build an overview of the literature on co-creation to explore what the existing literature relate to and indeed to pinpoint if any pattern or streams can be identified. A main finding from the analysis is how co-creation tends...

  3. [The laryngeal mask].

    Science.gov (United States)

    Poltroniéri, J

    1990-01-01

    A new type of airway has been widely used for two years, throughout hospitals in the United Kingdom. Designed and created since 1983 by Dr AIJ Brain, the Laryngeal Mask Airway (LMA) is a compromise between the endotracheal tube and the face-mask. Blindly inserted in an anaesthetized patient, without either a laryngoscope or neuromuscular blockade, it provides a good airway in almost all cases. It is often able to offer an effective alternative to difficult intubation. The LMA can be used with either spontaneous or positive pressure ventilation. Because it doesn't provide a reliable protection of the airway from aspiration, it should never be used in the patient with a full stomach. The spontaneously breathing patient, undergoing elective surgery for 15 to 60 minutes, in supine position, who would ordinarily be managed with a face-mask is the more likely candidate for the LMA. But, longer procedures, in lateral or prone position, with controlled ventilation can usually be carried out using the Brain's device. More effective and less demanding than the facial-mask, much less hurtful than the endotracheal tube, the Laryngeal Mask is potentially an important and valuable addition to anaesthetic care.

  4. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  5. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  6. COAs: Behind the Masks.

    Science.gov (United States)

    Birke, Szifra

    1993-01-01

    Provides information on alcoholism and codependency to help teachers identify and respond to children of alcoholics (COAs). Discusses characteristics of alcoholic homes and problems encountered by children and adult COAs. Examines survival "masks" of COAs, including hero, rebel, adjustor, clown, and caretaker. Lists organizational,…

  7. Masked mycotoxins: a review.

    Science.gov (United States)

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders.

  8. Creationism in Europe

    DEFF Research Database (Denmark)

    antievolutionism in countries and religions throughout Europe. Providing a unique map of creationism in Europe, the authors chart the surprising history of creationist activities and strategies there. Over the past forty years, creationism has spread swiftly among European Catholics, Protestants, Jews, Hindus...

  9. The VIRMOS mask manufacturing tools; 2, Mask manufacturing and handling

    CERN Document Server

    Conti, G; Mattaini, E; MacCagni, D; Lefèvre, O; Saisse, M; Vettolani, G

    1999-01-01

    We describe the VIRMOS Mask Manufacturing Unit (MMU) configuration, composed of two units:the Mask Manufacturing Machine (with its Control Unit) and the Mask Handling Unit (inclusive of Control Unit, Storage Cabinets and robot for loading of the Instrument Cabinets). For both VIMOS and NIRMOS instruments, on the basis of orders received by the Mask Preparation Software (see paper (a) in same proceedings), the function of the MMU is to perform an off-line mask cutting and identification, followed by mask storing and subsequent filling of the Instrument Cabinets (IC). We describe the characteristics of the LPKF laser cutting machine and the work done to support the choice of this equipment. We also describe the remaining of the hardware configuration and the Mask Handling Software.

  10. Mask industry quality assessment

    Science.gov (United States)

    Strott, Al; Bassist, Larry

    1994-12-01

    Product quality and timely delivery are two of the most important parameters in determining the success of a mask manufacturing facility. Because of the sensitivity of this data, very little was known about industry performance in these areas until an assessment was authored and presented at the 1993 BACUS Symposium by Larry Regis of Intel Corporation, Neil Paulsen of Intel Corporation, and James A. Reynolds of Reynolds Consulting. This data has been updated and will be published and presented at this year's BACUS Symposium. Contributor identities will again remain protected by utilizing Arthur Andersen & Company to compile the submittals. Participation was consistent with last year's representation of over 75% of the total merchant and captive mask volume in the United States. The data compiled includes shipments, customer return rate, customer return reasons from 1988 through Q2, 1994, performance to schedule, plate survival yield, and throughput time (TPT).

  11. Masked multichannel analyzer

    Science.gov (United States)

    Winiecki, A.L.; Kroop, D.C.; McGee, M.K.; Lenkszus, F.R.

    1984-01-01

    An analytical instrument and particularly a time-of-flight-mass spectrometer for processing a large number of analog signals irregularly spaced over a spectrum, with programmable masking of portions of the spectrum where signals are unlikely in order to reduce memory requirements and/or with a signal capturing assembly having a plurality of signal capturing devices fewer in number than the analog signals for use in repeated cycles within the data processing time period.

  12. Automation Enhancement of Multilayer Laue Lenses

    Energy Technology Data Exchange (ETDEWEB)

    Lauer K. R.; Conley R.

    2010-12-01

    X-ray optics fabrication at Brookhaven National Laboratory has been facilitated by a new, state of the art magnetron sputtering physical deposition system. With its nine magnetron sputtering cathodes and substrate carrier that moves on a linear rail via a UHV brushless linear servo motor, the system is capable of accurately depositing the many thousands of layers necessary for multilayer Laue lenses. I have engineered a versatile and automated control program from scratch for the base system and many subsystems. Its main features include a custom scripting language, a fully customizable graphical user interface, wireless and remote control, and a terminal-based interface. This control system has already been successfully used in the creation of many types of x-ray optics, including several thousand layer multilayer Laue lenses.Before reaching the point at which a deposition can be run, stencil-like masks for the sputtering cathodes must be created to ensure the proper distribution of sputtered atoms. Quality of multilayer Laue lenses can also be difficult to measure, given the size of the thin film layers. I employ my knowledge of software and algorithms to further ease these previously painstaking processes with custom programs. Additionally, I will give an overview of an x-ray optic simulator package I helped develop during the summer of 2010. In the interest of keeping my software free and open, I have worked mostly with the multiplatform Python and the PyQt application framework, utilizing C and C++ where necessary.

  13. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  14. BIRD FLU MASKS

    Directory of Open Access Journals (Sweden)

    YASAR KESKIN

    2006-08-01

    Full Text Available Avian influenza (bird flu is a disease of birds caused by influenza viruses closely related to human influenza viruses. The potential for transformation of avian influenza into a form that both causes severe disease in humans and spreads easily from person to person is a great concern for world health. The main purpose of a mask is to help prevent particles (droplets being expelled into the environment by the wearer. Masks are also resistant to fluids, and help protect the wearer from splashes of blood or other potentially infectious substances. They are not necessarily designed for filtration efficiency, or to seal tightly to the face. Masks and respirators are components of a number of infection control measures intended to protect healthcare workers, and prevent the spread of diseases. All healthcare workers who come into contact with a possible or probable case of any respiratory track infections should wear a respirator conforming to at least EN149:2001 FFP3. [TAF Prev Med Bull 2006; 5(4.000: 296-306

  15. Designer Modeling for Personalized Game Content Creation Tools

    DEFF Research Database (Denmark)

    Liapis, Antonios; Yannakakis, Georgios N.; Togelius, Julian

    2013-01-01

    With the growing use of automated content creation and computer-aided design tools in game development, there is potential for enhancing the design process through personalized interactions between the software and the game developer. This paper proposes designer modeling for capturing the designer......’s preferences, goals and processes from their interaction with a computer-aided design tool, and suggests methods and domains within game development where such a model can be applied. We describe how designer modeling could be integrated with current work on automated and mixed-initiative content creation...

  16. Extreme ultraviolet lithography: reflective mask technology

    Science.gov (United States)

    Walton, Christopher C.; Kearney, Patrick A.; Mirkarimi, Paul B.; Bowers, Joel M.; Cerjan, Charles J.; Warrick, Abbie L.; Wilhelmsen, Karl C.; Fought, Eric R.; Moore, Craig E.; Larson, Cindy C.; Baker, Sherry L.; Burkhart, Scott C.; Hector, Scott D.

    2000-07-01

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7 nm-pitch bi-layers of Mo and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150 mm substrates, it was upgraded in July 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects > 100 nm below 0.05/cm2. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross- platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  17. Extreme Ultraviolet Lithography - Reflective Mask Technology

    Energy Technology Data Exchange (ETDEWEB)

    Walton, C.C.; Kearney, P.A.; Mirkarimi, P.B.; Bowers, J.M.; Cerjan, C.; Warrick, A.L.; Wilhelmsen, K.; Fought, E.; Moore, C.; Larson, C.; Baker, S.; Burkhart, S.C.; Hector, S.D.

    2000-05-09

    EUVL mask blanks consist of a distributed Bragg reflector made of 6.7nm-pitch bi-layers of MO and Si deposited upon a precision Si or glass substrate. The layer deposition process has been optimized for low defects, by application of a vendor-supplied but highly modified ion-beam sputter deposition system. This system is fully automated using SMIF technology to obtain the lowest possible environmental- and handling-added defect levels. Originally designed to coat 150mm substrates, it was upgraded in July, 1999 to 200 mm and has coated runs of over 50 substrates at a time with median added defects >100nm below 0.05/cm{sup 2}. These improvements have resulted from a number of ion-beam sputter deposition system modifications, upgrades, and operational changes, which will be discussed. Success in defect reduction is highly dependent upon defect detection, characterization, and cross-platform positional registration. We have made significant progress in adapting and extending commercial tools to this purpose, and have identified the surface scanner detection limits for different defect classes, and the signatures of false counts and non-printable scattering anomalies on the mask blank. We will present key results and how they have helped reduce added defects. The physics of defect reduction and mitigation is being investigated by a program on multilayer growth over deliberately placed perturbations (defects) of varying size. This program includes modeling of multilayer growth and modeling of defect printability. We developed a technique for depositing uniformly sized gold spheres on EUVL substrates, and have studied the suppression of the perturbations during multilayer growth under varying conditions. This work is key to determining the lower limit of critical defect size for EUV Lithography. We present key aspects of this work. We will summarize progress in all aspects of EUVL mask blank development, and present detailed results on defect reduction and mask blank

  18. CREATION OF PAKISTAN

    OpenAIRE

    Sindhu, Shakila Noor

    2017-01-01

    Creation of a country is not an ordinary situation. But creation of Pakistan is an exception in the world history. This is one of the most debated topics in the subcontinent's socioeconomic, literature, art and political realm. Scores of researchers have investigated this extraordinary historical development in a diversity of perspectives and paradigms. Variety of exogenous and endogenous factors and a range of variables that acted, reacted and interacted among each other are evaluated. ...

  19. Creationism in Europe

    DEFF Research Database (Denmark)

    Hjermitslev, Hans Henrik; Kjærgaard, Peter C.; Blancke, Stefaan

    2013-01-01

    which material is missing from the literature (the “gaps”) and signal which gaps we think should first be filled. Third, on the basis of a forthcoming international historical study, we outline the possible factors that affect the popularity of creationism in Europe (the “prospects”). We also sketch how...... a sustained study of European creationism can contribute to other research domains such as the study of cultural evolution and the relation between science and religion....

  20. Mask alignment system for semiconductor processing

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.; Grant, Christopher N.

    2017-02-14

    A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

  1. Assessing EUV mask defectivity

    Science.gov (United States)

    Okoroanyanwu, Uzodinma; Tchikoulaeva, Anna; Ackmann, Paul; Wood, Obert; La Fontaine, Bruno; Bubke, Karsten; Holfeld, Christian; Peters, Jan Hendrik; Kini, Sumanth; Watson, Sterling; Lee, Isaac; Mu, Bo; Lim, Phillip; Raghunathan, Sudhar; Boye, Carol

    2010-04-01

    This paper assesses the readiness of EUV masks for pilot line production. The printability of well characterized reticle defects, with particular emphasis on those reticle defects that cause electrical errors on wafer test chips, is investigated. The reticles are equipped with test marks that are inspected in a die-to-die mode (using DUV inspection tool) and reviewed (using a SEM tool), and which also comprise electrically testable patterns. The reticles have three modules comprising features with 32 nm ground rules in 104 nm pitch, 22 nm ground rules with 80 nm pitch, and 16 nm ground rules with 56 nm pitch (on the wafer scale). In order to determine whether specific defects originate from the substrate, the multilayer film, the absorber stack, or from the patterning process, the reticles were inspected after each fabrication step. Following fabrication, the reticles were used to print wafers on a 0.25 NA full-field ASML EUV exposure tool. The printed wafers were inspected with state of the art bright-field and Deep UV inspection tools. It is observed that the printability of EUV mask defects down to a pitch of 56 nm shows a trend of increased printability as the pitch of the printed pattern gets smaller - a well established trend at larger pitches of 80 nm and 104 nm, respectively. The sensitivity of state-of-the-art reticle inspection tools is greatly improved over that of the previous generation of tools. There appears to be no apparent decline in the sensitivity of these state-of-the-art reticle inspection tools for higher density (smaller) patterns on the mask, even down to 56nm pitch (1x). Preliminary results indicate that a blank defect density of the order of 0.25 defects/cm2 can support very early learning on EUV pilot line production at the 16nm node.

  2. Trends in mask data preparation

    Science.gov (United States)

    Fujimura, Aki; Pang, Liyong; Su, Bo; Choi, Yohan

    2014-10-01

    Whether for VSB mask writing or for multibeam mask writing, the shapes we need to write on masks are increasingly complex, increasingly curvilinear, and smaller in minimum width and space. The overwhelming trend in mask data preparation (MDP) is the shift from deterministic, rule-based, geometric, context-independent, shape-modulated, rectangular processing to statistical, simulation-based, context-dependent, dose- and shape-modulated any-shape processing. The paper briefly surveys the history of MDP, and explains through a simulation-based study that 50nm line and space is the tipping point where rule-based processing gives away to simulation-based processing.

  3. Masked hypertension: a systematic review.

    Science.gov (United States)

    Bobrie, Guillaume; Clerson, Pierre; Ménard, Joël; Postel-Vinay, Nicolas; Chatellier, Gilles; Plouin, Pierre-François

    2008-09-01

    The purpose of this research was to review the literature on masked hypertension. Studies, reviews and editorials on masked hypertension were identified by PubMed, Pascal BioMed and Cochrane literature systematic searches. Then, we carried out a meta-analysis of the six cohort studies reporting quantitative data for masked hypertension prognosis. There is still no clear consensus definition of masked hypertension and the reproducibility of the phenomenon is unknown. Nevertheless, the prevalence of masked hypertension seems to lie between 8 and 20%, and can be up to 50% in treated hypertensive patients. Subjects with masked hypertension have a higher risk of cardiovascular accidents [hazard ratios: 1.92 (1.51-2.44)] than normotensive subjects. This is due to a possible failure to recognize and appropriately manage this particular form of hypertension, the frequent association with other risk factors and coexisting target organ damage. The remaining unresolved questions are as follows: is masked hypertension a clinical entity that requires identification and characterization or a statistical phenomenon linked to the variability of blood pressure measurements?; because screening of the entire population is not feasible, how to identify individuals with masked hypertension?; and, in the absence of randomized trial, how to treat masked hypertension?

  4. What Is Being Masked in Object Substitution Masking?

    Science.gov (United States)

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  5. Philosophy of creation

    Directory of Open Access Journals (Sweden)

    Devyatova S. V.

    2016-01-01

    Full Text Available This article is devoted to consideration of the main principles of the concept elaborated by the famous English scientist and Christian theologian J. Polkinghorne and directed to formation more accurate idea of Creator and creation. The basic ideas of this concept: the necessity to theology a rational approach to comprehension not only of nature and peculiarities of the universe but also of its Creator; an importance of co-ordination of the modern Christian doctrine of creation with the scientific picture of the world; the great significance of natural theology for solving propounded tasks; our universe is a complex, developing by interaction of chance and law, but at the same time well-ordered and interrelated structure; human being is a part of this structure; the act of creation is a continuing process; God express Himself through His creation; Creator is simultaneously immanent and transcendent to His creation; Creator’s actions are dependent only on His free will; Creator is not impersonal, but rational, loving and suffering; Creator presented universe with an ability to self-development and human being with free will; realization of this self-development is accompanied by unpredictable consequences which are unknown not only for man, but for Creator also; God only of His own free will realized a self-limitation of His omnipotence because He loves human beings; one of our main tasks is to learn how to use our superior value - our freedom.

  6. Improve mask inspection capacity with Automatic Defect Classification (ADC)

    Science.gov (United States)

    Wang, Crystal; Ho, Steven; Guo, Eric; Wang, Kechang; Lakkapragada, Suresh; Yu, Jiao; Hu, Peter; Tolani, Vikram; Pang, Linyong

    2013-09-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The adoption of RET techniques like aggressive OPC, sub-resolution assist features combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for mask inspection operators and engineers. Therefore a comprehensive approach is required in handling defects post-inspections by correctly identifying and classifying the real killer defects impacting the printability on wafer, and ignoring nuisance defect and false defects caused by inspection systems. This paper focuses on the results from the evaluation of Automatic Defect Classification (ADC) product at the SMIC mask shop for the 40nm technology node. Traditionally, each defect is manually examined and classified by the inspection operator based on a set of predefined rules and human judgment. At SMIC mask shop due to the significant total number of detected defects, manual classification is not cost-effective due to increased inspection cycle time, resulting in constrained mask inspection capacity, since the review has to be performed while the mask stays on the inspection system. Luminescent Technologies Automated Defect Classification (ADC) product offers a complete and systematic approach for defect disposition and classification offline, resulting in improved utilization of the current mask inspection capability. Based on results from implementation of ADC in SMIC mask production flow, there was around 20% improvement in the inspection capacity compared to the traditional flow. This approach of computationally reviewing defects post mask-inspection ensures no yield loss by qualifying reticles without the errors associated with operator mis-classification or human error. The ADC engine retrieves the high resolution inspection images and uses a decision-tree flow to classify a given defect. Some identification mechanisms adopted by ADC to

  7. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  8. Automated High-Volume Manufacturing of Modular Photovoltaic Panel Assemblies for Space Solar Arrays Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Deployable Space Systems, Inc. (DSS) will focus the proposed SBIR program on the creation and development of an automated robotic manufacturing infrastructure...

  9. Warehouse automation

    OpenAIRE

    Pogačnik, Jure

    2017-01-01

    An automated high bay warehouse is commonly used for storing large number of material with a high throughput. In an automated warehouse pallet movements are mainly performed by a number of automated devices like conveyors systems, trolleys, and stacker cranes. From the introduction of the material to the automated warehouse system to its dispatch the system requires no operator input or intervention since all material movements are done automatically. This allows the automated warehouse to op...

  10. Designer Modeling for Personalized Game Content Creation Tools

    DEFF Research Database (Denmark)

    Liapis, Antonios; Yannakakis, Georgios N.; Togelius, Julian

    2013-01-01

    With the growing use of automated content creation and computer-aided design tools in game development, there is potential for enhancing the design process through personalized interactions between the software and the game developer. This paper proposes designer modeling for capturing the designer......, and envision future directions which focus on personalizing the processes to a designer’s particular wishes....

  11. Money creation and destruction

    OpenAIRE

    Faure, Salomon; Gersbach, Hans

    2016-01-01

    We study money creation and destruction in today’s monetary architecture and examine the impact of monetary policy and capital regulation in a general equilibrium setting. There are two types of money created and destructed: bank deposits, when banks grant loans to firms or to other banks and central bank money, when the central bank grants loans to private banks. We show that equilibria yield the first-best level of money creation and lending when prices are flexible, regardless of the monet...

  12. Masked Repetition Priming Using Magnetoencephalography

    Science.gov (United States)

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  13. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...... Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (P...

  14. Opposing Creationism: Scientists Organize.

    Science.gov (United States)

    Saladin, Kenneth S.

    1982-01-01

    Describes the response of the scientific community to creationist activism. A symposium entitled "Science and Belief" was held at the annual meeting of the American Association for the Advancement of Science to debate creationism. A network was organized to facilitate communication and political efficiency among anticreationist citizen lobbies.…

  15. Architectural Creation of Light

    DEFF Research Database (Denmark)

    Bülow, Katja

    2015-01-01

    Bidraget "Architectural Creation of Light" indgår sammen med 108 andre bidrag i bogen "You Say Light, I Think Shadow". Bogens indhold undersøger: "Hvad er lys". I dette bidrag besvares spørgsmålet gennem iagttagelser af arkitektstuderendes undersøgelser af lyset i deres arbejdsmodeller i...

  16. Path dependence and creation

    DEFF Research Database (Denmark)

    Garud, Raghu; Karnøe, Peter

    the place of agency in these theories that take history so seriously. In the end, they are as interested in path creation and destruction as they are in path dependence. This book is compiled of both theoretical and empirical writing. It shows relatively well-known industries such as the automobile...

  17. Creationism in Europe

    DEFF Research Database (Denmark)

    For decades, the creationist movement was primarily situated in the United States. Then, in the 1970s, American creationists found their ideas welcomed abroad, first in Australia and New Zealand, then in Korea, India, South Africa, Brazil, and elsewhere—including Europe, where creationism plays a...

  18. Opposing Creationism: Scientists Organize.

    Science.gov (United States)

    Saladin, Kenneth S.

    1982-01-01

    Describes the response of the scientific community to creationist activism. A symposium entitled "Science and Belief" was held at the annual meeting of the American Association for the Advancement of Science to debate creationism. A network was organized to facilitate communication and political efficiency among anticreationist citizen…

  19. Creationism in Europe

    DEFF Research Database (Denmark)

    Hjermitslev, Hans Henrik; Kjærgaard, Peter C.; Blancke, Stefaan;

    2013-01-01

    The purpose of our article is threefold. First, we present and discuss the extant literature on creationism in Europe (the “facts”). Within this section, we offer a review of the literature as well as an overview of the most remarkable developments and events recorded therein. Second, we indicate...

  20. Opposing Creationism: Scientists Organize.

    Science.gov (United States)

    Saladin, Kenneth S.

    1982-01-01

    Describes the response of the scientific community to creationist activism. A symposium entitled "Science and Belief" was held at the annual meeting of the American Association for the Advancement of Science to debate creationism. A network was organized to facilitate communication and political efficiency among anticreationist citizen…

  1. Architectural Creation of Light

    DEFF Research Database (Denmark)

    Bülow, Katja

    2015-01-01

    Bidraget "Architectural Creation of Light" indgår sammen med 108 andre bidrag i bogen "You Say Light, I Think Shadow". Bogens indhold undersøger: "Hvad er lys". I dette bidrag besvares spørgsmålet gennem iagttagelser af arkitektstuderendes undersøgelser af lyset i deres arbejdsmodeller i...

  2. A procedure and program to calculate shuttle mask advantage

    Science.gov (United States)

    Balasinski, A.; Cetin, J.; Kahng, A.; Xu, X.

    2006-10-01

    A well-known recipe for reducing mask cost component in product development is to place non-redundant elements of layout databases related to multiple products on one reticle plate [1,2]. Such reticles are known as multi-product, multi-layer, or, in general, multi-IP masks. The composition of the mask set should minimize not only the layout placement cost, but also the cost of the manufacturing process, design flow setup, and product design and introduction to market. An important factor is the quality check which should be expeditious and enable thorough visual verification to avoid costly modifications once the data is transferred to the mask shop. In this work, in order to enable the layer placement and quality check procedure, we proposed an algorithm where mask layers are first lined up according to the price and field tone [3]. Then, depending on the product die size, expected fab throughput, and scribeline requirements, the subsequent product layers are placed on the masks with different grades. The actual reduction of this concept to practice allowed us to understand the tradeoffs between the automation of layer placement and setup related constraints. For example, the limited options of the numbers of layer per plate dictated by the die size and other design feedback, made us consider layer pairing based not only on the final price of the mask set, but also on the cost of mask design and fab-friendliness. We showed that it may be advantageous to introduce manual layer pairing to ensure that, e.g., all interconnect layers would be placed on the same plate, allowing for easy and simultaneous design fixes. Another enhancement was to allow some flexibility in mixing and matching of the layers such that non-critical ones requiring low mask grade would be placed in a less restrictive way, to reduce the count of orphan layers. In summary, we created a program to automatically propose and visualize shuttle mask architecture for design verification, with

  3. Automated dust storm detection using satellite images. Development of a computer system for the detection of dust storms from MODIS satellite images and the creation of a new dust storm database

    Science.gov (United States)

    El-Ossta, Esam Elmehde Amar

    Dust storms are one of the natural hazards, which have increased in frequency in the recent years over Sahara desert, Australia, the Arabian Desert, Turkmenistan and northern China, which have worsened during the last decade. Dust storms increase air pollution, impact on urban areas and farms as well as affecting ground and air traffic. They cause damage to human health, reduce the temperature, cause damage to communication facilities, reduce visibility which delays both road and air traffic and impact on both urban and rural areas. Thus, it is important to know the causation, movement and radiation effects of dust storms. The monitoring and forecasting of dust storms is increasing in order to help governments reduce the negative impact of these storms. Satellite remote sensing is the most common method but its use over sandy ground is still limited as the two share similar characteristics. However, satellite remote sensing using true-colour images or estimates of aerosol optical thickness (AOT) and algorithms such as the deep blue algorithm have limitations for identifying dust storms. Many researchers have studied the detection of dust storms during daytime in a number of different regions of the world including China, Australia, America, and North Africa using a variety of satellite data but fewer studies have focused on detecting dust storms at night. The key elements of this present study are to use data from the Moderate Resolution Imaging Spectroradiometers on the Terra and Aqua satellites to develop more effective automated method for detecting dust storms during both day and night and generate a MODIS dust storm database..

  4. Biological Activity of Masked Endotoxin

    Science.gov (United States)

    Schwarz, Harald; Gornicec, Jan; Neuper, Theresa; Parigiani, Maria Alejandra; Wallner, Michael; Duschl, Albert; Horejs-Hoeck, Jutta

    2017-01-01

    Low endotoxin recovery (LER) is a recently discovered phenomenon describing the inability of limulus amebocyte lysate (LAL)-based assays to detect lipopolysaccharide (LPS) because of a “masking effect” caused by chelators or detergents commonly used in buffer formulations for medical products and recombinant proteins. This study investigates the masking capacities of different buffer formulations and whether masked endotoxin is biologically active. We show that both naturally occurring endotoxin as well as control standard endotoxin can be affected by LER. Furthermore, whereas masked endotoxin cannot be detected in Factor C based assays, it is still detectable in a cell-based TLR4-NF-κB-luciferase reporter gene assay. Moreover, in primary human monocytes, masked LPS induces the expression of pro-inflammatory cytokines and surface activation markers even at very low concentrations. We therefore conclude that masked LPS is a potent trigger of immune responses, which emphasizes the potential danger of masked LPS, as it may pose a health threat in pharmaceutical products or compromise experimental results. PMID:28317862

  5. Hg-Mask Coronagraph

    Science.gov (United States)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  6. Accounting Automation

    OpenAIRE

    Laynebaril1

    2017-01-01

    Accounting Automation   Click Link Below To Buy:   http://hwcampus.com/shop/accounting-automation/  Or Visit www.hwcampus.com Accounting Automation” Please respond to the following: Imagine you are a consultant hired to convert a manual accounting system to an automated system. Suggest the key advantages and disadvantages of automating a manual accounting system. Identify the most important step in the conversion process. Provide a rationale for your response. ...

  7. Mechanical alignment of substrates to a mask

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.; Honan, Michael; Amato, Luigi G.; Grant, Christopher Neil; Strassner, James D.

    2016-11-08

    A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the mask and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.

  8. Home Automation

    OpenAIRE

    Ahmed, Zeeshan

    2010-01-01

    In this paper I briefly discuss the importance of home automation system. Going in to the details I briefly present a real time designed and implemented software and hardware oriented house automation research project, capable of automating house's electricity and providing a security system to detect the presence of unexpected behavior.

  9. Creation of Auditing Knowledge:

    DEFF Research Database (Denmark)

    Liempd, Dennis van

      Even though auditing research could play a role in understanding the many challenges that are threatening the profession, and in providing possible solutions, it seems to have failed in adequately doing so. This is for a major part because of a lack of research into auditing's basic assumptions......, and a too one-sided view on the creation of auditing knowledge. The purpose of this paper is to call for more (diverse) research in this area. Earlier calls have been few and far between, and have not resulted in a lot of research. Within the last two decades though, the auditing universe has changed so...... much that high-quality auditing research never has been needed more. By reviewing available literature challenges to the auditing profession are explored, and the creation of knowledge in general and auditing knowledge in particular are discussed with respect to methodological approaches and operative...

  10. Creationism and intelligent design.

    Science.gov (United States)

    Pennock, Robert T

    2003-01-01

    Creationism, the rejection of evolution in favor of supernatural design, comes in many varieties besides the common young-earth Genesis version. Creationist attacks on science education have been evolving in the last few years through the alliance of different varieties. Instead of calls to teach "creation science," one now finds lobbying for "intelligent design" (ID). Guided by the Discovery Institute's "Wedge strategy," the ID movement aims to overturn evolution and what it sees as a pernicious materialist worldview and to renew a theistic foundation to Western culture, in which human beings are recognized as being created in the image of God. Common ID arguments involving scientific naturalism, "irreducible complexity," "complex specified information," and "icons of evolution," have been thoroughly examined and refuted. Nevertheless, from Kansas to Ohio to the U.S. Congress, ID continues lobbying to teach the controversy, and scientists need to be ready to defend good evolution education.

  11. Constructing optimized binary masks for reservoir computing with delay systems

    Science.gov (United States)

    Appeltant, Lennert; van der Sande, Guy; Danckaert, Jan; Fischer, Ingo

    2014-01-01

    Reservoir computing is a novel bio-inspired computing method, capable of solving complex tasks in a computationally efficient way. It has recently been successfully implemented using delayed feedback systems, allowing to reduce the hardware complexity of brain-inspired computers drastically. In this approach, the pre-processing procedure relies on the definition of a temporal mask which serves as a scaled time-mutiplexing of the input. Originally, random masks had been chosen, motivated by the random connectivity in reservoirs. This random generation can sometimes fail. Moreover, for hardware implementations random generation is not ideal due to its complexity and the requirement for trial and error. We outline a procedure to reliably construct an optimal mask pattern in terms of multipurpose performance, derived from the concept of maximum length sequences. Not only does this ensure the creation of the shortest possible mask that leads to maximum variability in the reservoir states for the given reservoir, it also allows for an interpretation of the statistical significance of the provided training samples for the task at hand.

  12. Vibrotactile masking through the body.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-09-01

    Touches on one hand or forearm can affect tactile sensitivity at contralateral locations on the opposite side of the body. These interactions suggest an intimate connection between the two sides of the body. Here, we explore the effect of masking not across the body but through the body by measuring the effect of a masking stimulus on the back on the tactile sensitivity of the corresponding point on the front. Tactile sensitivity was measured on each side of the stomach, while vibrotactile masking stimulation was applied to one side of the front and to points on the back including the point directly behind the test point on the front. Results were compared to sensitivity, while vibrotactile stimulation was applied to a control site on the shoulder. A reduction in sensitivity of about .8 dB was found that required the masking stimulus to be within about 2 cm of the corresponding point on the back.

  13. Mask specification guidelines in spacer patterning technology

    Science.gov (United States)

    Hashimoto, Kohji; Mukai, Hidefumi; Miyoshi, Seiro; Yamaguchi, Shinji; Mashita, Hiromitsu; Kobayashi, Yuuji; Kawano, Kenji; Hirano, Takashi

    2008-11-01

    We have studied both the mask CD specification and the mask defect specification for spacer patterning technology (SPT). SPT has the possibility of extending optical lithography to below 40nm half-pitch devices. Since SPT necessitates somewhat more complicated wafer process flow, the CD error and mask defect printability on wafers involve more process factors compared with conventional single-exposure process (SEP). This feature of SPT implies that it is very important to determine mask-related specifications for SPT in order to select high-end mask fabrication strategies; those are for mask writing tools, mask process development, materials, inspection tools, and so on. Our experimental studies reveal that both mask CD specification and mask defect specification are somehow relaxed from those in ITRS2007. This is most likely because SPT reduces mask CD error enhanced factor (MEF) and the reduction of line-width roughness (LWR).

  14. AutoMOPS- B2B and B2C in mask making: Mask manufacturing performance and customer satisfaction improvement through better information flow management using generic models and standardized languages

    Science.gov (United States)

    Filies, Olaf; de Ridder, Luc; Rodriguez, Ben; Kujiken, Aart

    2002-03-01

    Semiconductor manufacturing has become a global business, in which companies of different size unite in virtual enterprises to meet new opportunities. Therefore Mask manufacturing is a key business, but mask ordering is a complex process and is always critical regarding design to market time, even though mask complexity and customer base are increasing using a wide variety of different mask order forms which are frequently faulty and very seldom complete. This is effectively blocking agile manufacturing and can tie wafer fabs to a single mask The goal of the project is elimination of the order verification through paperless, electronically linked information sharing/exchange between chip design, mask production and production stages, which will allow automation of the mask preparation. To cover these new techniques and their specifications as well as the common ones with automated tools a special generic Meta-model will be generated, based on the current standards for mask specifications, including the requirements from the involved partners (Alcatel Microelectronics, Altis, Compugraphics, Infineon, Nimble, Sigma-C), the project works out a pre-normative standard. The paper presents the current status of work. This work is partly funded by the Commission of the European Union under the Fifth Framework project IST-1999-10332 AutoMOPS.

  15. The mysterious noh mask: contribution of multiple facial parts to the recognition of emotional expressions.

    Directory of Open Access Journals (Sweden)

    Hiromitsu Miyata

    Full Text Available BACKGROUND: A Noh mask worn by expert actors when performing on a Japanese traditional Noh drama is suggested to convey countless different facial expressions according to different angles of head/body orientation. The present study addressed the question of how different facial parts of a Noh mask, including the eyebrows, the eyes, and the mouth, may contribute to different emotional expressions. Both experimental situations of active creation and passive recognition of emotional facial expressions were introduced. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, participants either created happy or sad facial expressions, or imitated a face that looked up or down, by actively changing each facial part of a Noh mask image presented on a computer screen. For an upward tilted mask, the eyebrows and the mouth shared common features with sad expressions, whereas the eyes with happy expressions. This contingency tended to be reversed for a downward tilted mask. Experiment 2 further examined which facial parts of a Noh mask are crucial in determining emotional expressions. Participants were exposed to the synthesized Noh mask images with different facial parts expressing different emotions. Results clearly revealed that participants primarily used the shape of the mouth in judging emotions. The facial images having the mouth of an upward/downward tilted Noh mask strongly tended to be evaluated as sad/happy, respectively. CONCLUSIONS/SIGNIFICANCE: The results suggest that Noh masks express chimeric emotional patterns, with different facial parts conveying different emotions This appears consistent with the principles of Noh which highly appreciate subtle and composite emotional expressions, as well as with the mysterious facial expressions observed in Western art. It was further demonstrated that the mouth serves as a diagnostic feature in characterizing the emotional expressions. This indicates the superiority of biologically-driven factors over the

  16. Contralateral tactile masking between forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2014-03-01

    Masking effects have been demonstrated in which tactile sensitivity is affected when one touch is close to another on the body surface. Such effects are likely a result of local lateral inhibitory circuits that sharpen the spatial tuning of a given tactile receptor. Mutually inhibitory pathways have also been demonstrated between cortical tactile maps of the two halves of the body. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at contralateral locations. Here, we measure the spatial tuning and effect of posture on this contralateral masking effect. Tactile sensitivity was measured on one forearm, while vibrotactile masking stimulation was applied to the opposite arm. Results were compared to sensitivity while vibrotactile stimulation was applied to a control site on the right shoulder. Sensitivity on the forearm was reduced by over 3 dB when the arms were touching and by 0.52 dB when they were held parallel. The masking effect depended on the position of the masking stimulus. Its effectiveness fell off by 1 STD when the stimulus was 29 % of arm length from the corresponding contralateral point. This long-range inhibitory effect in the tactile system suggests a surprisingly intimate relationship between the two sides of the body.

  17. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  18. Autopoiesis as Self-Creation and the Source of Creation

    Directory of Open Access Journals (Sweden)

    Saulius Kanišauskas

    2011-04-01

    Full Text Available The article focuses on the phenomenon of creation from Varela's autopoiesis theory point of view in the context of cognitive sciences and synergetics. Creation is defined as emergence and finding of new qualities; four levels of it are distinguished: absolute, essential, normal and adaptive. It is revealed that Varela's autopoiesis is a process of creation in which autopoiesis intertwines with praxis, i.e. spontaneous and emergent development of something new is inseparable from materializing activity. The conception of endogenic source creation is analyzed taking into consideration deep philosophical insights of autopoiesis theory and positions of cognitive science alongside with downward causation conception. An attempt is made to show that the conception of endogenic source is in principle compatible with the conception of exogenic source creation (they complement each other. It should be noted that poiesis (creation is related to the determined chaos in the human brain which forms during sleep. 

  19. Automated Tools for Rapid Prototyping

    Institute of Scientific and Technical Information of China (English)

    潘锦平

    1991-01-01

    An automated environment is presented which aids the software engineers in developing data processing systems by using rapid prototyping techniques.The environment is being developed on VAX station.It can render good support to the specification of the requirements and the rapid creation of prototype.The goal,the methodology,the general structure of the environment and two sub-systems are discussed.

  20. Production mask composition checking flow

    Science.gov (United States)

    Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Wang, Alice; Lin, Roger; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2016-05-01

    The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations including writing, etching, metrology, etc. There still exist many potential errors that could occur when the frame, main circuit and dummies all together form a whole reticle. The MDCC flow combines the design rule check (DRC) and MRC concepts to adapt to the complex patterns in today's wafer production technologies. Although photomask data has unique characteristics, the MRC tool in Calibre® MDP can easily achieve mask composition by using the Extended MEBES job deck (EJB) format. In EJB format, we can customize the combination of any input layers in an IC design layout format, such as OASIS. Calibre MDP provides section-based processing for many standard verification rule format (SVRF) commands that support DRC-like checks on mask data. Integrating DRC-like checking with EJB for layer composition, we actually perform reticle-level DRC, which is the essence of MDCC. The flow also provides an early review environment before the photomask pattern files are available. Furthermore, to incorporate the MDCC in our production flow, runtime is one of the most important indexes we consider. When the MDCC is included in the tape-out flow, the runtime impact is very limited. Calibre, with its multi-threaded processes and good scalability, is the key to achieving acceptable runtime. In this paper, we present real case runtime data for 28nm and 14nm technology nodes, and prove the practicability of placing MDCC into mass production.

  1. Masked Hypertension in Diabetes Mellitus

    Science.gov (United States)

    Franklin, Stanley S.; Thijs, Lutgarde; Li, Yan; Hansen, Tine W.; Boggia, José; Liu, Yanping; Asayama, Kei; Björklund-Bodegård, Kristina; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Kuznetsova, Tatiana; Stolarz-Skrzypek, Katarzyna; Tikhonoff, Valérie; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Sandoya, Edgardo; Kawecka-Jaszcz, Kalina; Filipovský, Jan; Imai, Yutaka; Wang, Jiguang; Ibsen, Hans; O’Brien, Eoin; Staessen, Jan A.

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (Phypertensives tended to be higher than in normotensives (hazard rate [HR], 1.96; 95% confidence interval [CI], 0.97–3.97; P=0.059), similar to untreated stage 1 hypertensives (HR, 1.07; CI, 0.58–1.98; P=0.82), but less than stage 2 hypertensives (HR, 0.53; CI, 0.29–0.99; P=0.048). In contrast, cardiovascular risk was not significantly different in antihypertensive-treated diabetic-masked hypertensives, as compared with the normotensive comparator group (HR, 1.13; CI, 0.54–2.35; P=0.75), stage 1 hypertensives (HR, 0.91; CI, 0.49–1.69; P=0.76), and stage 2 hypertensives (HR, 0.65; CI, 0.35–1.20; P=0.17). In the untreated diabetic-masked hypertensive population, mean conventional systolic/diastolic blood pressure was 129.2±8.0/76.0±7.3 mm Hg, and mean daytime systolic/diastolic blood pressure 141.5±9.1/83.7±6.5 mm Hg. In conclusion, masked hypertension occurred in 29% of untreated diabetics, had comparable cardiovascular risk as stage 1 hypertension, and would require considerable reduction in conventional blood pressure to reach daytime ambulatory treatment goal. Importantly, many hypertensive diabetics when receiving antihypertensive therapy can present with normalized conventional and elevated ambulatory blood pressure that mimics masked hypertension. PMID:23478096

  2. Informational masking and musical training.

    Science.gov (United States)

    Oxenham, Andrew J; Fligor, Brian J; Mason, Christine R; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  3. Aesthetics and collective creation

    DEFF Research Database (Denmark)

    Jakobsen, Annette Svaneklink

    2013-01-01

    Tokyo, Nicolas Bourriaud (Bourriaud:1998) and now, the art centre stands as place where a cultural institution, an architectural mode of thinking and participatory artistic experiments work together. Recently, is has become of increasing interest to art museums to be relational and socially aware...... possibilities for relations and differentiated movement patterns to further transform the potentials of visitorʼs interactions with each other and with works of art. Lacaton & Vassalʼs relational, bottom-up architecture resonated well with the aesthetic thinking by one of the initial directors of the Palais de...... that reactualises the experimental exhibition space designed by Lina Bo Bardi for Museu de Arte de Sao Paulo (1968). These aspects of the practice of museums and art centres, where social change, creation and exhibition experience affect each other raise the question of how (social) change is related to aesthetics...

  4. Life after stoma creation

    DEFF Research Database (Denmark)

    Danielsen, Anne Kjærgaard

    2013-01-01

    , as well as an alteration in the bodily design. Research in the field may provide additional information about central elements when adapting to life with a stoma. There are currently no studies that adequately focus on the relationship between health-related quality of life and stoma construction...... in a Danish context, neither for temporary or permanent construction, nor in relation to the importance of stoma handling. Purpose: The overall objective of the study was to investigate health-related quality of life related to stoma creation and patient education. Methodologically, the project......: Impact on everyday life and Educational Needs. The study included 15 participants who were interviewed in groups related to whether they were treated for cancer or non-cancer. The results showed that participants often experienced the stoma as a taboo, and emotions related to stigma were identified...

  5. Library Automation

    OpenAIRE

    Dhakne, B. N.; Giri, V. V.; Waghmode, S. S.

    2010-01-01

    New technologies library provides several new materials, media and mode of storing and communicating the information. Library Automation reduces the drudgery of repeated manual efforts in library routine. By use of library automation collection, Storage, Administration, Processing, Preservation and communication etc.

  6. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  7. Automation or De-automation

    Science.gov (United States)

    Gorlach, Igor; Wessel, Oliver

    2008-09-01

    In the global automotive industry, for decades, vehicle manufacturers have continually increased the level of automation of production systems in order to be competitive. However, there is a new trend to decrease the level of automation, especially in final car assembly, for reasons of economy and flexibility. In this research, the final car assembly lines at three production sites of Volkswagen are analysed in order to determine the best level of automation for each, in terms of manufacturing costs, productivity, quality and flexibility. The case study is based on the methodology proposed by the Fraunhofer Institute. The results of the analysis indicate that fully automated assembly systems are not necessarily the best option in terms of cost, productivity and quality combined, which is attributed to high complexity of final car assembly systems; some de-automation is therefore recommended. On the other hand, the analysis shows that low automation can result in poor product quality due to reasons related to plant location, such as inadequate workers' skills, motivation, etc. Hence, the automation strategy should be formulated on the basis of analysis of all relevant aspects of the manufacturing process, such as costs, quality, productivity and flexibility in relation to the local context. A more balanced combination of automated and manual assembly operations provides better utilisation of equipment, reduces production costs and improves throughput.

  8. The Formal Approach to Computer Game Rule Development Automation

    OpenAIRE

    Elena, A

    2009-01-01

    Computer game rules development is one of the weakly automated tasks in game development. This paper gives an overview of the ongoing research project which deals with automation of rules development for turn-based strategy computer games. Rules are the basic elements of these games. This paper proposes a new approach to automation including visual formal rules model creation, model verification and modelbased code generation.

  9. Ludic Educational Game Creation Tool

    DEFF Research Database (Denmark)

    Vidakis, Nikolaos; Syntychakis, Efthimios; Kalafatis, Konstantinos

    2015-01-01

    creation tool features a web editor, where the game narrative can be manipulated, according to specific needs. Moreover, this tool is applied for creating an educational game according to a reference scenario namely teaching schoolers road safety. A ludic approach is used both in game creation and play...

  10. The Co-creation Continuum

    DEFF Research Database (Denmark)

    Ind, Nicholas; Iglesias, Oriol; Markovic, Stefan

    2017-01-01

    Co-creation can open up a brand to the outside world and help it to generate relevant innovations. However, there is scarce empirical evidence as to how managers actually use co-creation to connect with customers and other stakeholders and build enduring innovation-oriented relationships with the...

  11. Automating Your Ready-Reference File.

    Science.gov (United States)

    Thomas, Joy; Sottong, Stephen P.

    1994-01-01

    Describes the automation of the ready reference card file at the California State University, Long Beach library. Topics discusses include the use of dBase III Plus software; keyword fields for multiple access points; the source field and other fields; a menu-driven interface; and file creation and maintenance. (Contains five references.) (LRW)

  12. ARTISTIC AND SCIENTIFIC CREATION PROCESS MANAGEMENT

    Directory of Open Access Journals (Sweden)

    Ioan Tudor

    2013-12-01

    Full Text Available Cultural creation is not ex nihilo, but a conversion of old “material” into a new form or a re-signifying, or a new combination of preexisting elements. Art, as well as science, has been characterized as acts of dominating and transforming nature. In art, the process is real and in science it is virtual. This process is characterized by an efficient management of the means of expression which must be subordinated to the message that the piece of art wants to transmit and the scientist exploits facts in order to make them significant as support, expression and exemplification of the laws of nature. There is also an ontogenesis of management: individual evolution which takes place by virtue of a program, thanks to devices with self-regulating capabilities. This aspect may be particularly interesting for cyberneticists. In contemporary civilization the transfer of certain aspects of the creation process to automated machines implies programming, algorithms. Man is an algorithmic being.

  13. All new custom path photo book creation

    Science.gov (United States)

    Wang, Wiley; Muzzolini, Russ

    2012-03-01

    In this paper, we present an all new custom path to allow consumers to have full control to their photos and the format of their books, while providing them with guidance to make their creation fast and easy. The users can choose to fully automate the initial creation, and then customize every page. The system manage many design themes along with numerous design elements, such as layouts, backgrounds, embellishments and pattern bands. The users can also utilize photos from multiple sources including their computers, Shutterfly accounts, Shutterfly Share sites and Facebook. The users can also use a photo as background, add, move and resize photos and text - putting what they want where they want instead of being confined to templates. The new path allows users to add embellishments anywhere in the book, and the high-performance platform can support up to 1,000 photos per book and up to 25 pictures per page. The path offers either Smart Autofill or Storyboard features allowing customers to populate their books with photos so they can add captions and customize the pages.

  14. Value Creation in International Business

    DEFF Research Database (Denmark)

    Vedel, Mette; Servais, Per

    2017-01-01

    The edited collection brings into focus the meanings, interpretations and the process of value creation in international business. Exploring value creation in the context of emerging and developed economies, Volume 2 takes the perspective of small and medium sized enterprises and examines various...... approaches to value creation in the process of firm internationalization. Providing theoretical and practical insights, the authors open an intellectual debate into what value is, and how it is created through the internationalization activities of firms. Value Creation in International Business...... is a pioneering two volume work intended to provoke theoretical and empirical development in International Business research. Moreover, it is intended as a bridge between concepts derived from general business firm-level research agendas such as value creation and business model, and internationalization...

  15. Job Creation and Job Types

    DEFF Research Database (Denmark)

    Kuhn, Johan Moritz; Malchow-Møller, Nikolaj; Sørensen, Anders

    2016-01-01

    We extend earlier analyses of the job creation of start-ups versus established firms by considering the educational content of the jobs created and destroyed. We define education-specific measures of job creation and job destruction at the firm level, and we use these measures to construct...... a measure of “surplus job creation”, defined as jobs created on top of any simultaneous destruction of similar jobs in incumbent firms in the same region and industry. Using Danish employer-employee data from 2002–2007 that identify the start-ups and that cover almost the entire private sector......, these measures allow us to provide a more nuanced assessment of the role of entrepreneurial firms in the job-creation process than in previous studies. Our findings show that although start-ups are responsible for the entire overall net job creation, incumbents account for more than one-third of net job creation...

  16. Job Creation and Job Types

    DEFF Research Database (Denmark)

    Kuhn, Johan M.; Malchow-Møller, Nikolaj; Sørensen, Anders

    We extend earlier analyses of the job creation of start-ups vs. established firms by taking into consideration the educational content of the jobs created and destroyed. We define educationspecific measures of job creation and job destruction at the firm level, and we use these to construct...... a measure of “surplus job creation” defined as jobs created on top of any simultaneous destruction of similar jobs in incumbent firms in the same region and industry. Using Danish employer-employee data from 2002-7, which identify the start-ups and which cover almost the entire private sector......, these measures allow us to provide a more nuanced assessment of the role of entrepreneurial firms in the job-creation process than previous studies. Our findings show that while start-ups are responsible for the entire overall net job creation, incumbents account for more than a third of net job creation within...

  17. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  18. Mask qualification strategies in a wafer fab

    Science.gov (United States)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  19. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show...

  20. AUTOMATED TECHNIQUE FOR CREATING LITHOLOGIC LOG PLOTS

    Directory of Open Access Journals (Sweden)

    Kristijan Posavec

    2006-12-01

    Full Text Available Paper presents automated technique for creating lithologic log plots. Technique is based on three computer tools: Microsoft (MS Access program, LogPlot program, and Visual Basic (VB macros for MS Excel. MS Access ensures professional storage of lithologic data which can be in that way easier and faster entered, searched, updated, and also used for different purposes, while LogPlot provides tools for creating lithologic log plots. VB macros enable transfer of lithologic data from MS Access to LogPlot. Data stored in MS Access are exported in ASCII files which are later used by LogPlot for creation of lithologic log plots. Presented concept facilitates creation of lithologic log plots, and automated technique enables processing of a large number of data i.e. creation of lareg number lithologic log plots in a short period of time (the paper is published in Croatian.

  1. Shadows alter facial expressions of Noh masks.

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety)", which highly appreciates subtle emotional expressions in the darkness.

  2. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  3. Spatial release from informational masking

    Science.gov (United States)

    Rakerd, Brad; Aaronson, Neil L.

    2001-05-01

    A new method for investigating spatial release from informational masking was developed and employed in two experiments. The new method is computer controlled and efficient. It employs the versatile coordinate response measure speech stimulus set [Bolia et al., J. Acoust. Soc. Am. 107, 1065 (2000)]. The experiments were conducted in an anechoic room, with a primary loudspeaker in front of the listener and a secondary loudspeaker at 60 deg to the right. Target messages were presented from the primary speaker only. For a standard, distractor messages, simultaneous with the target, were also presented from the primary speaker only. Spatial release was measured by presenting the distractors from both primary and secondary speakers with a temporal offset. Experiment 1 fixed the offset (secondary leading, +4 ms) and varied the number of distractors (1 to 3) and the target-to-distractor ratio (-12 to +4 dB). Masking release, sometimes as large as 10 dB, was found for all combinations of these variables. Experiment 2 varied the offset over a wide range of values. Substantial release from masking was found for both positive and negative offsets, but only in the range in which speech echoes are suppressed (<50 ms). [Work supported by NIDCD grant DC 00181.

  4. Knowledge Sharing is Knowledge Creation

    DEFF Research Database (Denmark)

    Greve, Linda

    2015-01-01

    communication and knowledge creation to an intervention study in a large Danish food production company. For some time a specific group of employees uttered a wish for knowledge sharing, but it never really happened. The group was observed and submitted to metaphor analysis as well as analysis of co......-creation strategies. Confronted with the results, the group completely altered their approach to knowledge sharing and let it become knowledge co-creation. The conclusions are, that knowledge is and can only be a diverse and differentiated concept, and that groups are able to embrace this complexity. Thus rather than...

  5. Job Creation and Job Types

    DEFF Research Database (Denmark)

    Kuhn, Johan M.; Malchow-Møller, Nikolaj; Sørensen, Anders

    , these measures allow us to provide a more nuanced assessment of the role of entrepreneurial firms in the job-creation process than previous studies. Our findings show that while start-ups are responsible for the entire overall net job creation, incumbents account for more than a third of net job creation within...... high-skilled jobs. Moreover, start-ups “only” create around half of the surplus jobs, and even less of the high-skilled surplus jobs. Finally, our approach allows us to characterize and identify differences across industries, educational groups and regions....

  6. Automatic classification and accurate size measurement of blank mask defects

    Science.gov (United States)

    Bhamidipati, Samir; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter

    2015-07-01

    A blank mask and its preparation stages, such as cleaning or resist coating, play an important role in the eventual yield obtained by using it. Blank mask defects' impact analysis directly depends on the amount of available information such as the number of defects observed, their accurate locations and sizes. Mask usability qualification at the start of the preparation process, is crudely based on number of defects. Similarly, defect information such as size is sought to estimate eventual defect printability on the wafer. Tracking of defect characteristics, specifically size and shape, across multiple stages, can further be indicative of process related information such as cleaning or coating process efficiencies. At the first level, inspection machines address the requirement of defect characterization by detecting and reporting relevant defect information. The analysis of this information though is still largely a manual process. With advancing technology nodes and reducing half-pitch sizes, a large number of defects are observed; and the detailed knowledge associated, make manual defect review process an arduous task, in addition to adding sensitivity to human errors. Cases where defect information reported by inspection machine is not sufficient, mask shops rely on other tools. Use of CDSEM tools is one such option. However, these additional steps translate into increased costs. Calibre NxDAT based MDPAutoClassify tool provides an automated software alternative to the manual defect review process. Working on defect images generated by inspection machines, the tool extracts and reports additional information such as defect location, useful for defect avoidance[4][5]; defect size, useful in estimating defect printability; and, defect nature e.g. particle, scratch, resist void, etc., useful for process monitoring. The tool makes use of smart and elaborate post-processing algorithms to achieve this. Their elaborateness is a consequence of the variety and

  7. High performance mask fabrication process for the next-generation mask production

    Science.gov (United States)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2014-07-01

    ArF immersion lithography combined with double patterning has been used for fabricating below half pitch 40nm devices. However, when pattern size shrinks below 20nm, we must use new technology like quadruple patterning process or next generation lithography (NGL) solutions. Moreover, with change in lithography tool, next generation mask production will be needed. According to ITRS 2013, fabrication of finer patterns less than 15nm will be required on mask plate in NGL mask production 5 years later [1]. In order to fabricate finer patterns on mask, higher resolution EB mask writer and high performance fabrication process will be required. In a previous study, we investigated a potential of mask fabrication process for finer patterning and achieved 17nm dense line pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer and chemically amplified resist [2][3]. After a further investigation, we constructed higher performance mask process by using new EB mask writer EBM9000. EBM9000 is the equipment supporting hp16nm generation's photomask production and has high accuracy and high throughput. As a result, we achieved 15.5nm pattern on mask with high productivity. Moreover, from evaluation of isolated pattern, we proved that current mask process has the capability for sub-10nm pattern. These results show that the performance of current mask fabrication process have the potential to fabricate the next-generation mask.

  8. Mask data volume: explosion or damp squib?

    Science.gov (United States)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell

    2005-11-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  9. Computational mask defect review for contamination and haze inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram; Wolf, Yulian; Shah, Pinkesh

    2013-09-01

    the mask manufacturing process. The latter characterization qualifies real defect signatures, such as pin-dots or pin-holes, extrusions or intrusions, assist-feature or dummy-fill defects, writeerrors or un-repairable defects, chrome-on-shifter or missing chrome-from-shifter defects, particles, etc., and also false defect signatures, such as those due to inspection tool registration or image alignment, interlace artifacts, CCD camera artifacts, optical shimmer, focus errors, etc. Such qualitative characterization of defects has enabled better inspection tool SPC and process defect control in the mask shop. In this paper, the same computational approach to defect review has been extended to contamination style defect inspections, including Die-to-Die reflected, and non Die-to-Die or single-die inspections. In addition to the computational methods used for transmitted aerial images, defects detected in die-to-die reflected light mode are analyzed based on special defect and background coloring in reflected-light, and other characteristics to determine the exact type and severity. For those detected in the non Die-to-Die mode, only defect images are available from the inspection tool. Without a reference, i.e., defect-free image, it is often difficult to determine the true nature or impact of the defect in question. Using a combination of inspection-tool modeling and image inversion techniques, Luminescent's LAIPHTM system generates an accurate reference image, and then proceeds with automated defect characterization as if the images were simply from a die-to-die inspection. The disposition of contamination style defects this way, filters out >90% of false and nuisance defects that otherwise would have been manually reviewed or measured on AIMSTM. Such computational defect review, unifying defect disposition across all available inspection modes, has been imperative to ensuring no yield losses due to errors in operator defect classification on one hand, and on the other

  10. Helical apodizers for tunable hyper Gaussian masks

    Science.gov (United States)

    Ojeda-Castañeda, J.; Ledesma, Sergio; Gómez-Sarabia, Cristina M.

    2013-09-01

    We discuss an optical method for controlling the half-width of Gaussian like transmittance windows, by using a pair of absorption masks that have both radial and helical amplitude variations. For describing the radial part of the proposed masks, we employ amplitude transmittance profiles of the form T(ρ) = exp(- ρ s ). For s = 2, one has an amplitude transmittance that is proportional to a Gaussian function. A sub Gaussian mask is defined by a value of s 2, one has super Gaussian masks. Our discussion considers that any of these radially varying masks has also helical modulations. We show that by using a suitable pair of this type of masks, one can control the halfwidth of Gaussian like windows.

  11. Automated segmentation of mucosal change in rhinosinusitis patients

    Science.gov (United States)

    Sensakovic, William F.; Pinto, Jayant M.; Baroody, Faud M.; Starkey, Adam; Armato, Samuel G., III

    2010-03-01

    Rhinosinusitis is a sinonasal disease affecting 16% of the population. Volumetric segmentation can provide objective data that is useful when determining stage and therapeutic response. An automated volumetric segmentation method was developed and tested. Four patients underwent baseline and follow-up CT scans. For each patient, five sections were outlined by two otolaryngologists and the automated method. The median Dice coefficient between otolaryngologists was 0.74. The otolaryngologist and automated segmentations demonstrated acceptable agreement with a median Dice coefficient of 0.61. This automated method represents the first step in the creation of a computerized system for the quantitative 3D analysis of rhinosinusitis.

  12. Automating Finance

    Science.gov (United States)

    Moore, John

    2007-01-01

    In past years, higher education's financial management side has been riddled with manual processes and aging mainframe applications. This article discusses schools which had taken advantage of an array of technologies that automate billing, payment processing, and refund processing in the case of overpayment. The investments are well worth it:…

  13. Modeling Repulsive Gravity with Creation

    Indian Academy of Sciences (India)

    R. G. Vishwakarma; J. V. Narlikar

    2007-03-01

    There is a growing interest among cosmologists for theories with negative energy scalar fields and creation, in order to model a repulsive gravity. The classical steady state cosmology proposed by Bondi, Gold & Hoyle in 1948, was the first such theory which used a negative kinetic energy creation field to invoke creation of matter. We emphasize that creation plays a very crucial role in cosmology and provides a natural explanation to the various explosive phenomena occurring in local ( < 0.1) and extra galactic universe.We exemplify this point of view by considering the resurrected version of this theory – the quasi-steady state theory, which tries to relate creation events directly to the large scale dynamics of the universe and supplies more natural explanations of the observed phenomena. Although the theory predicts a decelerating universe at the present era, it explains successfully the recent SNe Ia observations (which require an accelerating universe in the standard cosmology), as we show in this paper by performing a Bayesian analysis of the data.

  14. Color, light, and altruistic creation

    Science.gov (United States)

    Charnay, Yves

    2002-06-01

    It seems necessary to me to combine a certain technical inventivity with plastic creation, a particular poetry arises from this relation. The sources of inspiration for works, especially works in which color plays a pre-eminent role, do not only come from nature. The fantasy of the creators evolves and changes thanks to discoveries and technological inventions. My work as a painter has made me particularly sensitive to the diversity of the plastic writings in general and to the chromatic writings in particular. (1) Environmental creation imposes a renewal of the means of creation. Conducting experimental works, I study the particularities of light, mainly its incidence on materials (transmission, reflection, colors, textures, etc.) and its mobility. These works are a source of inspiration for my architectural works and nurture my lectures at the Ecole Nationale Superieure des Arts Decoratifs (National College of Decorative Arts). Environmental creation also imposes some qualities on the artist since he, whether he serves a social entity or a person, serves the whole collectivity. Environmental creation has to be envisaged as an altruistic approach.

  15. Computational defect review for actinic mask inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram

    2013-04-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The limitation of 1.35 NA posed by water-based lithography has led to the application of various resolution enhancement techniques (RET), for example, use of strong phase-shifting masks, aggressive OPC and sub-resolution assist features, customized illuminators, etc. The adoption of these RET techniques combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for a mask inspection engineer. Inspecting masks under their actinic-aerial image conditions would detect defects that are more likely to print under those exposure conditions. However, this also makes reviewing such defects in their low-contrast aerial images very challenging. On the other hand, inspecting masks under higher resolution inspection optics would allow for better viewing of defects post-inspection. However, such inspections generally would also detect many more defects, including printable and nuisance, thereby making it difficult to judge which are of real concern for printability on wafer. Often, an inspection engineer may choose to use Aerial and/or high resolution inspection modes depending on where in the process flow the mask is and the specific device-layer characteristics of the mask. Hence, a comprehensive approach is needed in handling defects both post-aerial and post-high resolution inspections. This analysis system is designed for the Applied Materials Aera™ mask inspection platform, all data reported was collected using the Aera.

  16. X-ray lithography masking

    Science.gov (United States)

    Smith, Henry I. (Inventor); Lim, Michael (Inventor); Carter, James (Inventor); Schattenburg, Mark (Inventor)

    1998-01-01

    X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

  17. Components of Co-creation

    DEFF Research Database (Denmark)

    Tanev, Stoyan

    2009-01-01

    , such an approach misses the advantages of an empirically driven quantitative approach that benefits from larger size samples and is more appropriate for theory building through the development and testing of hypotheses. It is important, therefore, to seek the development of a research methodology that combines...... the benefits of both qualitative and quantitative research approaches for studying the nature of value co-creation. The article provides a first attempt to identify the main research steps of such a methodology. It provides some preliminary results on the key components of value co-creation between firms...... of both qualitative and quantitative techniques. One of the main contributions of this article is to suggest and explore the possibility for using the QCA technique in future research on value co-creation....

  18. Movement in aesthetic form creation

    DEFF Research Database (Denmark)

    Thomsen, Bente Dahl

    2015-01-01

    This paper presents the good practice based experiences found when movement is used to strengthen form creation and to create flow in the process of artistic education. Faced with the design engineering students’ problems with creating forms with aesthetic statements, the experiences with movement...... inspired the thesis that the design engineers’ training in aesthetic form creation can be improved by integrating the movement potential into their education. The paper documents the on-going work on developing a model for embodied creation of form called ‘Somatechne model’. The study also identifies...... a lens to assess the students’ development of mind-body skills, known as ‘The Three Soma’. The Somatechne model also helps to identify the activity that gives the students the opportunity to develop their sensibility and thus aesthetic attention....

  19. Model-based mask verification on critical 45nm logic masks

    Science.gov (United States)

    Sundermann, F.; Foussadier, F.; Takigawa, T.; Wiley, J.; Vacca, A.; Depre, L.; Chen, G.; Bai, S.; Wang, J.-S.; Howell, R.; Arnoux, V.; Hayano, K.; Narukawa, S.; Kawashima, S.; Mohri, H.; Hayashi, N.; Miyashita, H.; Trouiller, Y.; Robert, F.; Vautrin, F.; Kerrien, G.; Planchot, J.; Martinelli, C.; Di-Maria, J. L.; Farys, V.; Vandewalle, B.; Perraud, L.; Le Denmat, J. C.; Villaret, A.; Gardin, C.; Yesilada, E.; Saied, M.

    2008-05-01

    In the continuous battle to improve critical dimension (CD) uniformity, especially for 45-nanometer (nm) logic advanced products, one important recent advance is the ability to accurately predict the mask CD uniformity contribution to the overall global wafer CD error budget. In most wafer process simulation models, mask error contribution is embedded in the optical and/or resist models. We have separated the mask effects, however, by creating a short-range mask process model (MPM) for each unique mask process and a long-range CD uniformity mask bias map (MBM) for each individual mask. By establishing a mask bias map, we are able to incorporate the mask CD uniformity signature into our modelling simulations and measure the effects on global wafer CD uniformity and hotspots. We also have examined several ways of proving the efficiency of this approach, including the analysis of OPC hot spot signatures with and without the mask bias map (see Figure 1) and by comparing the precision of the model contour prediction to wafer SEM images. In this paper we will show the different steps of mask bias map generation and use for advanced 45nm logic node layers, along with the current results of this new dynamic application to improve hot spot verification through Brion Technologies' model-based mask verification loop.

  20. Evolutionary Creation: Moving beyond the Evolution versus Creation Debate

    Science.gov (United States)

    Lamoureux, Denis O.

    2010-01-01

    Evolutionary creation offers a conservative Christian approach to evolution. It explores biblical faith and evolutionary science through a Two Divine Books model and proposes a complementary relationship between Scripture and science. The Book of God's Words discloses the spiritual character of the world, while the Book of God's Works reveals the…

  1. Co-Creation in Distributed Value Creation Systems and Networks

    DEFF Research Database (Denmark)

    Bang, Anne Louise; Christensen, Poul Rind

    organizational systems with activities crossing organizational boundaries. Based on this assumption, it is proposed that designing includes stakeholders in a number of organizational units, cooperating in order to contribute to the process of creation and implementation of specific designs. It is thus proposed...

  2. Entrepreneuring as Organisation-Creation

    DEFF Research Database (Denmark)

    Hjorth, Daniel

    2014-01-01

    This chapter aims at making a contribution to the study of entrepreneurship and creativity by developing a processual conceptualisation of a form of entrepreneurial creativity called entrepreneuring or organisation-creation. Such a processual conceptualisation of entrepreneuring will answer...... the long-standing call in entrepreneurship research for an enhanced capacity to study organisation-in-creation. I believe recent advances in process thinking, in organisation studies have provided us, finally, with such 'changes in our perceptions and methodologies', meaning we have now a capacity to step...

  3. Value Co-creation Behaviour

    DEFF Research Database (Denmark)

    Laud, Gaurangi; Karpen, Ingo Oswald

    2017-01-01

    Purpose: The purpose of this paper is to identify antecedents and consequences ofcustomers’ value co-creation behaviour (VCB). VCB as a means to facilitatevalue realisation processes is gaining importance in service research andpractice. Encouraging such enactments can be challenging, but can also...... offercompetitive advantages. Design/methodology/approach: We empirically investigate a conceptual model by converging threecontemporary concepts of co-creation research – embeddedness, VCB and value-in-context– and examining the interdependencies between them. Data were collected in anonline forum of a leading...

  4. Shadows Alter Facial Expressions of Noh Masks

    Science.gov (United States)

    Kawai, Nobuyuki; Miyata, Hiromitsu; Nishimura, Ritsuko; Okanoya, Kazuo

    2013-01-01

    Background A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers’ recognition of the emotional expressions. Methodology/Principal Findings In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. Conclusions/Significance Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa’s smile. They also agree with the aesthetic principle of Japanese traditional art “yugen (profound grace and subtlety)”, which highly appreciates subtle emotional expressions in the darkness. PMID:23940748

  5. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  6. Heating automation

    OpenAIRE

    Tomažič, Tomaž

    2013-01-01

    This degree paper presents usage and operation of peripheral devices with microcontroller for heating automation. The main goal is to make a quality system control for heating three house floors and with that, increase efficiency of heating devices and lower heating expenses. Heat pump, furnace, boiler pump, two floor-heating pumps and two radiator pumps need to be controlled by this system. For work, we have chosen a development kit stm32f4 - discovery with five temperature sensors, LCD disp...

  7. Automation Security

    OpenAIRE

    Mirzoev, Dr. Timur

    2014-01-01

    Web-based Automated Process Control systems are a new type of applications that use the Internet to control industrial processes with the access to the real-time data. Supervisory control and data acquisition (SCADA) networks contain computers and applications that perform key functions in providing essential services and commodities (e.g., electricity, natural gas, gasoline, water, waste treatment, transportation) to all Americans. As such, they are part of the nation s critical infrastructu...

  8. Marketing automation

    OpenAIRE

    Raluca Dania TODOR

    2017-01-01

    The automation of the marketing process seems to be nowadays, the only solution to face the major changes brought by the fast evolution of technology and the continuous increase in supply and demand. In order to achieve the desired marketing results, businessis have to employ digital marketing and communication services. These services are efficient and measurable thanks to the marketing technology used to track, score and implement each campaign. Due to the...

  9. Masking the Feeling of Being Stupid.

    Science.gov (United States)

    Smith, Sally L.

    1988-01-01

    Teaching experience at The Lab School of Washington has shown that learning-disabled children and adults cope with their lack of self-esteem and feelings of stupidity by developing masks to hide their hurt. These include masks of super-competence, helplessness, invisibility, clowning, injustice collecting, indifference, boredom, outrageousness,…

  10. Masked hypertension, a review of the literature.

    NARCIS (Netherlands)

    Verberk, W.J.; Thien, Th.; Leeuw, P.W. de

    2007-01-01

    Masked hypertension (blood pressure that is normal in the physicians' office but elevated elsewhere) is a common phenomenon as prevalence among studies varies from 8 to 45% and is seen at all ages. large discrepancies, however, exist between studies that have dealt with masked hypertension. It is of

  11. Computing Challenges in Coded Mask Imaging

    Science.gov (United States)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  12. A facial mask comprising Dead Sea mud.

    Science.gov (United States)

    Abu-Jdayil, Basim; Mohameed, Hazim A

    2006-01-01

    Many investigators have proved that Dead Sea salt and mud are useful in treating skin disorders and skin diseases. Therefore, the black mud has been extensively used as a base for the preparation of soaps, creams, and unguents for skin care. This study concerns a facial mask made mainly of Dead Sea mud. The effects of temperature and shearing conditions on the rheological behavior of the facial mask were investigated. The mud facial mask exhibited a shear thinning behavior with a yield stress. It was found that the apparent viscosity of the mask has a strong dependence on the shear rate as well as on the temperature. The facial mask exhibited a maximum yield stress and very shear thinning behavior at 40 degrees C, which is attributed to the gelatinization of the polysaccharide used to stabilize the mud particles. On the other hand, the mud mask exhibited a time-independent behavior at low temperatures and shear rates and changed to a thixotropic behavior upon increasing both the temperature and the shear rate. The shear thinning and thixotropic behaviors have a significant importance in the ability of the facial mask to spread on the skin: the Dead Sea mud mask can break down for easy spreading, and the applied film can gain viscosity instantaneously to resist running. Moreover, particle sedimentation, which in this case would negatively affect consumer acceptance of the product, occurs slowly due to high viscosity at rest conditions.

  13. [Use of respiratory masks in healthcare workers].

    Science.gov (United States)

    Ciotti, C; Bouvet, E; Abiteboul, D

    2008-08-01

    Two different types of filtering respiratory masks are available in healthcare settings. The first ones are used to protect patients from droplets coming from the mouth of healthcare workers (HCW) and the second ones are protective masks. For the moment, we lack information regarding application of Ministry of Health recommendations and on adherence of HCW to mask use. Geres, the HCW exposure risk study group, and the INRS, are now conducting a survey in several hospitals in France to evaluate the use of respiratory masks in healthcare settings. Two phases are planned. Phase I is a self survey using a questionnaire for occupational doctors and hygienists and phase II includes three steps on HCW behavior: evaluation of knowledge and practice concerning respiratory masks, evaluation of respiratory mask use, evaluation of wear and fit test in a context of airborne isolation with a FFP1 and FFP2 respiratory mask. Phase I is finished and phase II is beginning. The first phase I data show that the Ministry's recommendations are observed: respiratory masks are available, written recommendations are present; information and training are organized for healthcare workers. Phase II results are not available yet.

  14. EUV mask pilot line at Intel Corporation

    Science.gov (United States)

    Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

    2004-12-01

    The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

  15. Enhanced Automatic Question Creator--EAQC: Concept, Development and Evaluation of an Automatic Test Item Creation Tool to Foster Modern e-Education

    Science.gov (United States)

    Gutl, Christian; Lankmayr, Klaus; Weinhofer, Joachim; Hofler, Margit

    2011-01-01

    Research in automated creation of test items for assessment purposes became increasingly important during the recent years. Due to automatic question creation it is possible to support personalized and self-directed learning activities by preparing appropriate and individualized test items quite easily with relatively little effort or even fully…

  16. Implementation on Landsat Data of a Simple Cloud Mask Algorithm Developed for MODIS Land Bands

    Science.gov (United States)

    Oreopoulos, Lazaros; Wilson, Michael J.; Varnai, Tamas

    2010-01-01

    This letter assesses the performance on Landsat-7 images of a modified version of a cloud masking algorithm originally developed for clear-sky compositing of Moderate Resolution Imaging Spectroradiometer (MODIS) images at northern mid-latitudes. While data from recent Landsat missions include measurements at thermal wavelengths, and such measurements are also planned for the next mission, thermal tests are not included in the suggested algorithm in its present form to maintain greater versatility and ease of use. To evaluate the masking algorithm we take advantage of the availability of manual (visual) cloud masks developed at USGS for the collection of Landsat scenes used here. As part of our evaluation we also include the Automated Cloud Cover Assesment (ACCA) algorithm that includes thermal tests and is used operationally by the Landsat-7 mission to provide scene cloud fractions, but no cloud masks. We show that the suggested algorithm can perform about as well as ACCA both in terms of scene cloud fraction and pixel-level cloud identification. Specifically, we find that the algorithm gives an error of 1.3% for the scene cloud fraction of 156 scenes, and a root mean square error of 7.2%, while it agrees with the manual mask for 93% of the pixels, figures very similar to those from ACCA (1.2%, 7.1%, 93.7%).

  17. Components of Co-creation

    DEFF Research Database (Denmark)

    Allen, Stephen; Bailetti, Tony; Tanev, Stoyan

    2013-01-01

    There is a growing body of literature dedicated to the discussion of value co -creation frameworks, mechanisms and processes. However , these typically focus on the study, discussion and analysis of a small number of cases using deep, ethnographic description of their practices aiming at conceptu...

  18. Electron pair creation by photons

    NARCIS (Netherlands)

    Holtwijk, Theodoor

    1960-01-01

    In our experiment on the creation of electron pairs a 5 MeV betatron was used as radiation source and a cloud chamber (with magnetic field) was used as detection instrument. The experimental arrangement is described in section 2.1. The cloud chamber was of the overcompression type so that the recove

  19. Knowledge Creation in Constructivist Learning

    Science.gov (United States)

    Jaleel, Sajna; Verghis, Alie Molly

    2015-01-01

    In today's competitive global economy characterized by knowledge acquisition, the concept of knowledge management has become increasingly prevalent in academic and business practices. Knowledge creation is an important factor and remains a source of competitive advantage over knowledge management. Constructivism holds that learners learn actively…

  20. Uprising of Creation in Education

    Science.gov (United States)

    Hatamleh, Habes Mohamed

    2015-01-01

    This research (Uprising of Creation in Education) aims at defining the importance of creativity in education, and its reflection on the elements of the educational process. Creativity is regarded an important element in the nations progress, which depends on the minds of their sons. Creativity became the language of the present age, after the…

  1. Juvenile Courts. Creation and development

    Directory of Open Access Journals (Sweden)

    Montserrat GONZÁLEZ FERNÁNDEZ

    2013-11-01

    Full Text Available This paper studies the creation of Juvenile or Children's Courts in Spain, analysing their reasons and aims, as well as the ethical and political connotations present on their way of acting. Their history and the one of the institutions that complement them is built from the legislation, writings and ideas of their promoters.

  2. Electron pair creation by photons

    NARCIS (Netherlands)

    Holtwijk, Theodoor

    1960-01-01

    In our experiment on the creation of electron pairs a 5 MeV betatron was used as radiation source and a cloud chamber (with magnetic field) was used as detection instrument. The experimental arrangement is described in section 2.1. The cloud chamber was of the overcompression type so that the recove

  3. Ecological ethics and creation faith

    Directory of Open Access Journals (Sweden)

    Ulrich Körtner

    2016-05-01

    Full Text Available Over past decades a concept of ecological ethics has taken root, which is often equated with environmental ethics. Church and theology have also responded to the environmental crisis. In the last third of the past century an intense discourse about the concerns and extent of a so called creation ethics was conducted. In connection with the question of a creation ethics, and the global responsibility of humans for the biosphere of our planet, the topic of creation has also gained new attention in dogmatics. In this way, ecology has also become a topic of systematic theology. The article focuses on the debate in the German speaking context. Occasionally, a quasi-religious elevation of ecology to the status of a doctrine of salvation is observable. Because theology always also has a function of critique of religion, it must also critically engage the sometimes open and sometimes hidden religious contents and claims of eco-ethical concepts. For this purpose, the first step of the present contribution is to more precisely determine the concepts of creation and nature. Thereafter, the problem of anthropocentrism is analysed. In a further step, the concept of sustainability is analysed. In conclusion, the main features of a responsibility-ethics model of ecological ethics are outlined.

  4. Knowledge Work and Knowledge Creation

    DEFF Research Database (Denmark)

    Dau, Susanne

    2016-01-01

    The purpose of this paper is to address how instruction influences the creative knowledge work. Based on different perspectives on instructions and the actions followed, this paper reveal how educators, having different competencies of ICT-instructions, influence students’ creative knowledge work......, and students’ knowledge creation....

  5. Extinction controlled adaptive phase-mask coronagraph

    CERN Document Server

    Bourget, P; Mawet, D; Haguenauer, P

    2012-01-01

    Context. Phase-mask coronagraphy is advantageous in terms of inner working angle and discovery space. It is however still plagued by drawbacks such as sensitivity to tip-tilt errors and chromatism. A nulling stellar coronagraph based on the adaptive phase-mask concept using polarization interferometry is presented in this paper. Aims. Our concept aims at dynamically and achromatically optimizing the nulling efficiency of the coronagraph, making it more immune to fast low-order aberrations (tip-tilt errors, focus, ...). Methods. We performed numerical simulations to demonstrate the value of the proposed method. The active control system will correct for the detrimental effects of image instabilities on the destructive interference. The mask adaptability both in size, phase and amplitude also compensates for manufacturing errors of the mask itself, and potentially for chromatic effects. Liquid-crystal properties are used to provide variable transmission of an annulus around the phase mask, but also to achieve t...

  6. Automated Desalting Apparatus

    Science.gov (United States)

    Spencer, Maegan K.; Liu, De-Ling; Kanik, Isik; Beegle, Luther

    2010-01-01

    Because salt and metals can mask the signature of a variety of organic molecules (like amino acids) in any given sample, an automated system to purify complex field samples has been created for the analytical techniques of electrospray ionization/ mass spectroscopy (ESI/MS), capillary electrophoresis (CE), and biological assays where unique identification requires at least some processing of complex samples. This development allows for automated sample preparation in the laboratory and analysis of complex samples in the field with multiple types of analytical instruments. Rather than using tedious, exacting protocols for desalting samples by hand, this innovation, called the Automated Sample Processing System (ASPS), takes analytes that have been extracted through high-temperature solvent extraction and introduces them into the desalting column. After 20 minutes, the eluent is produced. This clear liquid can then be directly analyzed by the techniques listed above. The current apparatus including the computer and power supplies is sturdy, has an approximate mass of 10 kg, and a volume of about 20 20 20 cm, and is undergoing further miniaturization. This system currently targets amino acids. For these molecules, a slurry of 1 g cation exchange resin in deionized water is packed into a column of the apparatus. Initial generation of the resin is done by flowing sequentially 2.3 bed volumes of 2N NaOH and 2N HCl (1 mL each) to rinse the resin, followed by .5 mL of deionized water. This makes the pH of the resin near neutral, and eliminates cross sample contamination. Afterward, 2.3 mL of extracted sample is then loaded into the column onto the top of the resin bed. Because the column is packed tightly, the sample can be applied without disturbing the resin bed. This is a vital step needed to ensure that the analytes adhere to the resin. After the sample is drained, oxalic acid (1 mL, pH 1.6-1.8, adjusted with NH4OH) is pumped into the column. Oxalic acid works as a

  7. SEMI-AUTOMATED TECHNIQUE FOR CREATING GEOLOGICAL PROFILES

    Directory of Open Access Journals (Sweden)

    Kristijan Posavec

    2006-12-01

    Full Text Available Paper presents semi-automated technique for creating geological profiles. Technique is based on manual geological correlation, and on computer tools which ensure automation of the remaining part of procedure, namely from lithological data storage to creation of graphical presentation of geological profiles. Microsoft (MS Access program was used for lithologic data storage while Visual Basic (VB macros for Excel were used for automated transfer of lithologic data from MS Access data base to Rockworks program. Rockworks was used for creation of work version of geologic profiles, and AutoCAD program for final graphical presentation of geological profiles. Presented concept facilitates automation of technical part of procedure for creating geological profiles and makes it easier and faster (the paper is published in Croatian.

  8. Mask tuning for process window improvement

    Science.gov (United States)

    Buttgereit, Ute; Birkner, Robert; Graitzer, Erez; Cohen, Avi; Triulzi, Benedetta; Romeo, Carmelo

    2011-03-01

    For the next years optical lithography stays at 193nm with a numerical aperture of 1.35. Mask design becomes more complex, mask and lithography specifications tighten. The k1 factor comes close to 0.25 which leads to a tremendously increased Mask Error Enhancement Factor (MEEF). This means that CD errors on mask are getting highly amplified on wafer. Process control becomes more important than ever. Accurate process control is a key factor to success to maintain a high yield in chip production. One key parameter to ensure a high and reliable functionality for any integrated circuit is the critical dimension uniformity (CDU). There are different contributors which impact the intra-field CD performance at wafer such as mask CD uniformity, scanner fingerprint, resist process etc. In the present work we focus on improvement of mask CD signature which is one of the main contributors to intra-field CD uniformity. The mask CD uniformity has been measured by WLCD32 which measures the CD based on proven aerial image technology. Based on this CD input the CD uniformity was corrected by CDC200TM and afterwards verified by WLCD32 measurement. The CDC200TM tool utilizes an ultrafast femto-second laser to write intra-volume shading elements (Shade-In ElementsTM) inside the bulk material of the mask. By adjusting the density of the shading elements, the light transmission through the mask is locally changed in a manner that improves wafer CDU when the corrected mask is printed. Additionally, the impact of the improved CD uniformity on the lithography process window was investigated. Goal of the work is to establish a process flow for mask CD uniformity improvement based on mask CD metrology by WLCD32 and mask CD uniformity control by CDC200TM and to verify its impact on the lithography process window. The proposed process flow will be validated by wafer prints. It was shown that the WLCD32 has an excellent correlation to wafer data and an outstanding CD repeatability. It provides

  9. Masking property of quantum random cipher with phase mask encryption

    Science.gov (United States)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  10. SCEW: a Microsoft Excel add-in for easy creation of survival curves.

    Science.gov (United States)

    Khan, Haseeb Ahmad

    2006-07-01

    Survival curves are frequently used for reporting survival or mortality outcomes of experimental pharmacological/toxicological studies and of clinical trials. Microsoft Excel is a simple and widely used tool for creation of numerous types of graphic presentations however it is difficult to create step-wise survival curves in Excel. Considering the familiarity of clinicians and biomedical scientists with Excel, an algorithm survival curves in Excel worksheet (SCEW) has been developed for easy creation of survival curves directly in Excel worksheets. The algorithm has been integrated in the form of Excel add-in for easy installation and usage. The program is based on modification of frequency data for binary break-up using the spreadsheet formula functions whereas a macro subroutine automates the creation of survival curves. The advantages of this program are simple data input, minimal procedural steps and the creation of survival curves in the familiar confines of Excel.

  11. Space and time in masking and crowding.

    Science.gov (United States)

    Lev, Maria; Polat, Uri

    2015-01-01

    Masking and crowding are major phenomena associated with contextual modulations, but the relationship between them remains unclear. We have recently shown that crowding is apparent in the fovea when the time available for processing is limited, pointing to the strong relationship between crowding in the spatial and temporal domains. Models of crowding emphasize the size (acuity) of the target and the spacing between the target and flankers as the main determinants that predict crowding. Our model, which is based on lateral interactions, posits that masking and crowding are related in the spatial and temporal domains at the fovea and periphery and that both can be explained by the increasing size of the human perceptive field (PF) with increasing eccentricity. We explored the relations between masking and crowding using letter identification and contrast detection by correlating the crowding effect with the estimated size of the PF and with masking under different spatiotemporal conditions. We found that there is a large variability in PF size and crowding effects across observers. Nevertheless, masking and crowding were both correlated with the estimated size of the PF in the fovea and periphery under a specific range of spatiotemporal parameters. Our results suggest that under certain conditions, crowding and masking share common neural mechanisms that underlie the spatiotemporal properties of these phenomena in both the fovea and periphery. These results could explain the transfer of training gains from spatiotemporal Gabor masking to letter acuity, reading, and reduced crowding.

  12. Intact crowding and temporal masking in dyslexia.

    Science.gov (United States)

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia.

  13. Pupil Masks for Spectrophotometry of Transiting Exoplanets

    Science.gov (United States)

    Itoh, Satoshi; Matsuo, Taro; Goda, Shohei; Shibai, Hiroshi; Sumi, Takahiro

    2017-09-01

    Spectrophotometric stability, which is crucial in the spectral characterization of transiting exoplanets, is affected by photometric variations arising from field-stop loss in space telescopes with pointing jitter or primary mirror deformation. This paper focuses on a new method for removing slit-loss or field-stop-loss photometric variation through the use of a pupil mask. Two types of pupil function are introduced: the first uses conventional (e.g., Gaussian or hyper-Gaussian) apodizing patterns; whereas the second, which we call a block-shaped mask, employs a new type of pupil mask designed for high photometric stability. A methodology for the optimization of a pupil mask for transit observations is also developed. The block-shaped mask can achieve a photometric stability of 10-5 for a nearly arbitrary field-stop radius when the pointing jitter is smaller than approximately 0.7λ /D and a photometric stability of 10-6 at a pointing jitter smaller than approximately 0.5λ /D. The impact of optical aberrations and mask imperfections upon mask performance is also discussed.

  14. Mask industry assessment trend analysis: 2012

    Science.gov (United States)

    Chan, Y. David

    2012-02-01

    Microelectronics industry leaders consistently cite the cost and cycle time of mask technology and mask supply among the top critical issues for lithography. A survey was designed by SEMATECH with input from semiconductor company mask technologists and merchant mask suppliers to objectively assess the overall conditions of the mask industry. With the continued support of the industry, this year's assessment was the tenth in the current series of annual reports. This year's survey is basically the same as the 2005 through 2011 surveys. Questions are grouped into six categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category is a multitude of questions that ultimately produce a detailed profile of both the business and technical status of the critical mask industry. We received data from 11 companies this year, which was a record high since the beginning of the series. The responding companies represented more than 96% of the volume shipped and about 90% of the 2011 revenue for the photomask industry. These survey reports are often used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. They will continue to serve as a valuable reference to identify strengths and opportunities. Results can also be used to guide future investments in critical path issues.

  15. Neopuff T-piece mask resuscitator: is mask leak related to watching the pressure dial?

    Science.gov (United States)

    Tracy, Mark B; Klimek, J; Shingde, V; Hinder, M; Maheshwari, R; Tracy, S K

    2010-09-01

    The aim of the study is to compare mask leak and delivered ventilation during Neopuff (NP) mask ventilation in two modes: (i) with NP pressure dial hidden and resuscitator watching chest wall (CW) rise with, (ii) CW movement hidden and resuscitator watching NP pressure dial. Thirty-six participants gave mask ventilation to a modified manikin designed to measure mask leak and delivered ventilation for two minutes in each mode randomly assigned. Paired t-tests were used to analyse differences in mean values. Linear regression was used to determine the association of mask leak with delivered ventilation. Of 7277 inflations analysed, 3621 were observing chest wall mode (CWM) and 3656 observing NP mode (NPM). Mask leak was similar between the groups; 31.6% for CWM and 31.5% (p = 0.56) for NPM. There were no significant differences in airways pressures and expired tidal volumes (TVe) between modes. Mask leak was strongly associated with TVe (R = -0.86 p mask leak is not greater when resuscitators watch the NP pressure dial. Mask leak is related to TVe. Mask ventilation training with manikins should include tidal volume measurements. © 2010 The Author(s)/Journal Compilation © 2010 Foundation Acta Paediatrica.

  16. Accelerating Value Creation with Accelerators

    DEFF Research Database (Denmark)

    Jonsson, Eythor Ivar

    2015-01-01

    Accelerators can help to accelerate value creation. Accelerators are short-term programs that have the objective of creating innovative and fast growing ventures. They have gained attraction as larger corporations like Microsoft, Barclays bank and Nordea bank have initiated and sponsored accelera......Accelerators can help to accelerate value creation. Accelerators are short-term programs that have the objective of creating innovative and fast growing ventures. They have gained attraction as larger corporations like Microsoft, Barclays bank and Nordea bank have initiated and sponsored...... an approach to facilitate implementation and realization of business ideas and is a lucrative approach to transform research into ventures and to revitalize regions and industries in transition. Investors have noticed that the accelerator approach is a way to increase the possibility of success by funnelling...

  17. Network testbed creation and validation

    Energy Technology Data Exchange (ETDEWEB)

    Thai, Tan Q.; Urias, Vincent; Van Leeuwen, Brian P.; Watts, Kristopher K.; Sweeney, Andrew John

    2017-03-21

    Embodiments of network testbed creation and validation processes are described herein. A "network testbed" is a replicated environment used to validate a target network or an aspect of its design. Embodiments describe a network testbed that comprises virtual testbed nodes executed via a plurality of physical infrastructure nodes. The virtual testbed nodes utilize these hardware resources as a network "fabric," thereby enabling rapid configuration and reconfiguration of the virtual testbed nodes without requiring reconfiguration of the physical infrastructure nodes. Thus, in contrast to prior art solutions which require a tester manually build an emulated environment of physically connected network devices, embodiments receive or derive a target network description and build out a replica of this description using virtual testbed nodes executed via the physical infrastructure nodes. This process allows for the creation of very large (e.g., tens of thousands of network elements) and/or very topologically complex test networks.

  18. Network testbed creation and validation

    Energy Technology Data Exchange (ETDEWEB)

    Thai, Tan Q.; Urias, Vincent; Van Leeuwen, Brian P.; Watts, Kristopher K.; Sweeney, Andrew John

    2017-04-18

    Embodiments of network testbed creation and validation processes are described herein. A "network testbed" is a replicated environment used to validate a target network or an aspect of its design. Embodiments describe a network testbed that comprises virtual testbed nodes executed via a plurality of physical infrastructure nodes. The virtual testbed nodes utilize these hardware resources as a network "fabric," thereby enabling rapid configuration and reconfiguration of the virtual testbed nodes without requiring reconfiguration of the physical infrastructure nodes. Thus, in contrast to prior art solutions which require a tester manually build an emulated environment of physically connected network devices, embodiments receive or derive a target network description and build out a replica of this description using virtual testbed nodes executed via the physical infrastructure nodes. This process allows for the creation of very large (e.g., tens of thousands of network elements) and/or very topologically complex test networks.

  19. Creationism, Evolution, and Science Education

    Energy Technology Data Exchange (ETDEWEB)

    Scott, Eugenie C. (National Center for Science Education)

    2005-06-22

    Many topics in the curriculum of American schools are controversial, but perhaps the one with the longest tenure is evolution. Three arguments are made against evolution: that it is allegedly weak science ('evolution is a theory in crisis'); that it is incompatible with religion; and that it is only 'fair' to 'balance' evolution with creationism. Regardless of the appropriateness of their application to science education, all three of the arguments are made to try to restrict the teaching of evolution. Variants of the fairness argument such as balancing evolution with 'scientific alternatives to evolution' or balancing evolution with 'arguments against evolution' have in fact become the current predominant antievolutionist strategy. Current events in the creationism/evolution controversy will be reviewed, and suggestions made for how to promote sound science education in the schools.

  20. Printed shadow masks for organic transistors

    Science.gov (United States)

    Noguchi, Yoshiaki; Sekitani, Tsuyoshi; Someya, Takao

    2007-09-01

    We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet. After the deposition of the pentacene layer, the shadow mask is peeled off from the base film without any mechanical damages to the lower structures. The mobility in the saturation regime is 0.4cm2/Vs and the on-off ratio exceeds 105.

  1. Laboratory automation: trajectory, technology, and tactics.

    Science.gov (United States)

    Markin, R S; Whalen, S A

    2000-05-01

    Laboratory automation is in its infancy, following a path parallel to the development of laboratory information systems in the late 1970s and early 1980s. Changes on the horizon in healthcare and clinical laboratory service that affect the delivery of laboratory results include the increasing age of the population in North America, the implementation of the Balanced Budget Act (1997), and the creation of disease management companies. Major technology drivers include outcomes optimization and phenotypically targeted drugs. Constant cost pressures in the clinical laboratory have forced diagnostic manufacturers into less than optimal profitability states. Laboratory automation can be a tool for the improvement of laboratory services and may decrease costs. The key to improvement of laboratory services is implementation of the correct automation technology. The design of this technology should be driven by required functionality. Automation design issues should be centered on the understanding of the laboratory and its relationship to healthcare delivery and the business and operational processes in the clinical laboratory. Automation design philosophy has evolved from a hardware-based approach to a software-based approach. Process control software to support repeat testing, reflex testing, and transportation management, and overall computer-integrated manufacturing approaches to laboratory automation implementation are rapidly expanding areas. It is clear that hardware and software are functionally interdependent and that the interface between the laboratory automation system and the laboratory information system is a key component. The cost-effectiveness of automation solutions suggested by vendors, however, has been difficult to evaluate because the number of automation installations are few and the precision with which operational data have been collected to determine payback is suboptimal. The trend in automation has moved from total laboratory automation to a

  2. Automated urinalysis.

    Science.gov (United States)

    Carlson, D A; Statland, B E

    1988-09-01

    Many sources of variation affect urinalysis testing. These are due to physiologic changes in the patient, therapeutic interventions, and collection, transportation, and storage of urine specimens. There are problems inherent to the manual performance of this high-volume test. Procedures are poorly standardized across the United States, and even within the same laboratory there can be significant technologist-to-technologist variability. The methods used can perturb the specimen so that recovery of analytes is less than 100 per cent in the aliquot examined. The absence of significant automation of the entire test, with the one exception of the Yellow IRIS, is unusual in the clinical laboratory setting, where most other hematology and chemistry testing has been fully automated. Our evaluation of the Yellow IRIS found that this system is an excellent way to improve the quality of the results and thereby physician acceptance. There is a positive impact for those centers using this instrument, both for the laboratory and for the hospital.

  3. Tom Pickering as a clinical scientist: masked hypertension.

    Science.gov (United States)

    Eguchi, Kazuo

    2010-04-01

    Masked hypertension has been 'unmasked' by the use of the out-of-office measurement of blood pressure, as home BP monitoring or ambulatory blood pressure monitoring has become available. The term masked hypertension could be used more widely than the original version of masked hypertension; morning hypertension, stress-induced hypertension, and nocturnal hypertension are all classified as subtypes of masked hypertension. Masked hypertension can also be seen in patients with diabetes, that could change clinical practice in diabetes. Masked hypertension is associated with cardiovascular events, but most of the outcome studies are on antihypertensive medications. Therefore, masked hypertension includes insufficient treatment of hypertension. In Dr Pickering's latest review of masked hypertension, prehypertension or high normal blood pressure was stressed as an associating factor with masked hypertension. The biggest theme in the field of hypertension is how we can detect masked hypertension. I present two interesting cases of possible masked hypertension in this commentary.

  4. Quantum Creation of BTZ Black Hole

    CERN Document Server

    Wu Zhong Chao

    1999-01-01

    The constrained Instanton method is used to study quantum creation of a BTZ black hole. It is found that the relative creation probability is the exponential of the negative sum of the entropy associated with the outer and inner black hole horizons. The quantum creation of the 4- or higher dimensional versions of the BTZ black hole are also studied.

  5. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  6. Automated Budget System

    Data.gov (United States)

    Department of Transportation — The Automated Budget System (ABS) automates management and planning of the Mike Monroney Aeronautical Center (MMAC) budget by providing enhanced capability to plan,...

  7. Polishing Your Transparencies: Mounting, Masking, Overlays.

    Science.gov (United States)

    Jobe, Holly; Cannon, Glenn

    This brief guide discusses the mounting of overhead transparencies on frames, the types of mounts, the proper masking for presentation, and the use of overlays. Numerous line drawings provide the reader with a helpful visual reference. (RAO)

  8. Masking of aluminum surface against anodizing

    Science.gov (United States)

    Crawford, G. B.; Thompson, R. E.

    1969-01-01

    Masking material and a thickening agent preserve limited unanodized areas when aluminum surfaces are anodized with chromic acid. For protection of large areas it combines well with a certain self-adhesive plastic tape.

  9. ILT based defect simulation of inspection images accurately predicts mask defect printability on wafer

    Science.gov (United States)

    Deep, Prakash; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter

    2016-05-01

    At advanced technology nodes mask complexity has been increased because of large-scale use of resolution enhancement technologies (RET) which includes Optical Proximity Correction (OPC), Inverse Lithography Technology (ILT) and Source Mask Optimization (SMO). The number of defects detected during inspection of such mask increased drastically and differentiation of critical and non-critical defects are more challenging, complex and time consuming. Because of significant defectivity of EUVL masks and non-availability of actinic inspection, it is important and also challenging to predict the criticality of defects for printability on wafer. This is one of the significant barriers for the adoption of EUVL for semiconductor manufacturing. Techniques to decide criticality of defects from images captured using non actinic inspection images is desired till actinic inspection is not available. High resolution inspection of photomask images detects many defects which are used for process and mask qualification. Repairing all defects is not practical and probably not required, however it's imperative to know which defects are severe enough to impact wafer before repair. Additionally, wafer printability check is always desired after repairing a defect. AIMSTM review is the industry standard for this, however doing AIMSTM review for all defects is expensive and very time consuming. Fast, accurate and an economical mechanism is desired which can predict defect printability on wafer accurately and quickly from images captured using high resolution inspection machine. Predicting defect printability from such images is challenging due to the fact that the high resolution images do not correlate with actual mask contours. The challenge is increased due to use of different optical condition during inspection other than actual scanner condition, and defects found in such images do not have correlation with actual impact on wafer. Our automated defect simulation tool predicts

  10. Role of mask in asian shamanism

    OpenAIRE

    POVALYASHKO GALINA; ABAYEVA SABINA

    2015-01-01

    In the article there is considered a phenomena of shamanism as a cultural universal. Analysis object is a clay mask of National Museum of the Republic of Kazakhstan. It was found in Keder settlement (Kuiryktobe), located in Otrar Oasis at one of the most busy part of the Silk Road. The mask as shamanistic ritual attribute is considered as an obligatory condition for meditative function of shaman.

  11. Automation 2017

    CERN Document Server

    Zieliński, Cezary; Kaliczyńska, Małgorzata

    2017-01-01

    This book consists of papers presented at Automation 2017, an international conference held in Warsaw from March 15 to 17, 2017. It discusses research findings associated with the concepts behind INDUSTRY 4.0, with a focus on offering a better understanding of and promoting participation in the Fourth Industrial Revolution. Each chapter presents a detailed analysis of a specific technical problem, in most cases followed by a numerical analysis, simulation and description of the results of implementing the solution in a real-world context. The theoretical results, practical solutions and guidelines presented are valuable for both researchers working in the area of engineering sciences and practitioners looking for solutions to industrial problems. .

  12. Marketing automation

    Directory of Open Access Journals (Sweden)

    TODOR Raluca Dania

    2017-01-01

    Full Text Available The automation of the marketing process seems to be nowadays, the only solution to face the major changes brought by the fast evolution of technology and the continuous increase in supply and demand. In order to achieve the desired marketing results, businessis have to employ digital marketing and communication services. These services are efficient and measurable thanks to the marketing technology used to track, score and implement each campaign. Due to the technical progress, the marketing fragmentation, demand for customized products and services on one side and the need to achieve constructive dialogue with the customers, immediate and flexible response and the necessity to measure the investments and the results on the other side, the classical marketing approached had changed continue to improve substantially.

  13. No masking between test and mask components in perceptually different depth planes.

    Science.gov (United States)

    Hibbeler, Patrick J; Olzak, Lynn A

    2011-01-01

    2-D cues to perceived depth organization have been used to segregate test and mask stimulus components in a discrimination task. Observers made either spatial-frequency or orientation judgments on a rectangular test component by itself or in the presence of constant rectangular masks. There were two basic masking conditions: same-plane or different-plane. In the same-plane conditions, the test components and masks are perceived as existing in the same depth plane. In the different-plane conditions, the test and mask components are perceived to exist in different depth planes. The perception of different depth planes was achieved by using perceived occlusion, which could place either component closer or further from the observer. The results suggest that when test and mask components are separated into different depth planes they no longer influence one another. This effect could be observed in either depth organization, test components in front of the masks or mask components in front of the test. These results indicate that the figure-ground organization of components is not important. Only the designation as existing in the same or different depth planes affects whether or not a mask is effective.

  14. Masked Uncontrolled Hypertension in CKD.

    Science.gov (United States)

    Agarwal, Rajiv; Pappas, Maria K; Sinha, Arjun D

    2016-03-01

    Masked uncontrolled hypertension (MUCH) is diagnosed in patients treated for hypertension who are normotensive in the clinic but hypertensive outside. In this study of 333 veterans with CKD, we prospectively evaluated the prevalence of MUCH as determined by ambulatory BP monitoring using three definitions of hypertension (daytime hypertension ≥135/85 mmHg; either nighttime hypertension ≥120/70 mmHg or daytime hypertension; and 24-hour hypertension ≥130/80 mmHg) or by home BP monitoring (hypertension ≥135/85 mmHg). The prevalence of MUCH was 26.7% by daytime ambulatory BP, 32.8% by 24-hour ambulatory BP, 56.1% by daytime or night-time ambulatory BP, and 50.8% by home BP. To assess the reproducibility of the diagnosis, we repeated these measurements after 4 weeks. Agreement in MUCH diagnosis by ambulatory BP was 75-78% (κ coefficient for agreement, 0.44-0.51), depending on the definition used. In contrast, home BP showed an agreement of only 63% and a κ coefficient of 0.25. Prevalence of MUCH increased with increasing clinic systolic BP: 2% in the 90-110 mmHg group, 17% in the 110-119 mmHg group, 34% in the 120-129 mmHg group, and 66% in the 130-139 mmHg group. Clinic BP was a good determinant of MUCH (receiver operating characteristic area under the curve 0.82; 95% confidence interval 0.76-0.87). In diagnosing MUCH, home BP was not different from clinic BP. In conclusion, among people with CKD, MUCH is common and reproducible, and should be suspected when clinic BP is in the prehypertensive range. Confirmation of MUCH diagnosis should rely on ambulatory BP monitoring.

  15. Man creation had began since the creation of the first biological ...

    African Journals Online (AJOL)

    Man creation had began since the creation of the first biological material very likely in ... of holy Qur'an verses related to the topic of man creation, the man creation had ... paper I will show that this conclusion is not in discordance with science.

  16. Phase mask coronagraphy at JPL and Palomar

    Directory of Open Access Journals (Sweden)

    Serabyn E.

    2011-07-01

    Full Text Available For the imaging of faint companions, phase mask coronagraphy has the dual advantages of a small inner working angle and high throughput. This paper summarizes our recent work in developing phase masks and in demonstrating their capabilities at JPL. Four-quadrant phase masks have been manufactured at JPL by means of both evaporation and etching, and we have been developing liquid crystal vortex phase masks in partnership with a commercial vendor. Both types of mask have been used with our extreme adaptive optics well-corrected subaperture at Palomar to detect known brown dwarf companions as close as ~ 2.5 λ/D to stars. Moreover, our recent vortex masks perform very well in laboratory tests, with a demonstrated infrared contrast of about 10−6 at 3 λ/D, and contrasts of a few 10−7 with an initial optical wavelength device. The demonstrated performance already meets the needs of ground-based extreme adaptive optics coronagraphy, and further planned improvements are aimed at reaching the 10−10 contrast needed for terrestrial exoplanet detection with a space-based coronagraph.

  17. Claude Levi-Strauss: Mask and Myth

    Directory of Open Access Journals (Sweden)

    Senka Kovač

    2016-02-01

    Full Text Available This paper discuss a relationship between mask and myth and how the appropriate analysis by Claude Levi-Strauss may make clearer a complex field of masks in the part of North America. Claude Levi-Strauss stressed the multi- layered character of myth structure. Similar multi-layered character can be seen at the level of expression, content and meaning of Salish, Kwakiutl and other unique masks of this part of North America. Claude Levi-Strauss analysed certain myths trying to explain ‘the path’ of the masks that belong to the people with similar languages, or those who lived nearby. The mythology of Tsimshian, Tlingit and Haïda people have certain common characteristics that point to the similarities with the nearby groups (Kwakiutl. Despite differences that exist at the level of meanings of the masks, there is also common ‘mythological heritage’ of the people who used to live in the Northern Pacific Coast. Claude Levi-Strauss showed that there is no final solution in the myth analysis, and that there is no possibility that the dissection of the problem will reveal some hidden unity. "As mythical though does not want to start clearly somewhere and come somewhere, it never goes through its whole trajectory: there is always something waiting to be fullfield. The same way as rituals, myths are infinite." It seems that Levi-Strauss explanation of the Path of masks goes in that direction.

  18. VSP wave separation by adaptive masking filters

    Science.gov (United States)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  19. Uncertainty and confusion in temporal masking

    Science.gov (United States)

    Formby, C.; Zhang, T.

    2001-05-01

    In a landmark study, Wright et al. [Nature 387, 176-178 (1997)] reported an apparent backward-masking deficit in language-impaired children. Subsequently, these controversial results have been influential in guiding treatments for childhood language problems. In this study we revisited Wright et al.'s temporal-masking paradigm to evaluate listener uncertainty effects. Masked detection was measured for 20-ms sinusoids (480, 1000, or 1680 Hz) presented at temporal positions before, during, or after a gated narrowband (W=600-1400 Hz) masker. Listener uncertainty was investigated by cueing various stimulus temporal properties with a 6000-Hz sinusoid presented either ipsi- or contra-lateral to the test ear or bilaterally. The primary cueing effect was measured in the backward-masking condition for a contralateral cue gated simultaneously with the on-frequency 1000-Hz signal. The resulting cued masked-detection threshold was reduced to quiet threshold. No significant cueing effects were obtained for other signal temporal positions in the masker nor for any off-frequency signal conditions. These results indicate that (1) uncertainty can be reduced or eliminated for on-frequency backward masking by cueing the signal and (2) the deficit reported by Wright et al. for language-impaired children may reflect uncertainty and confusion rather than a temporal-processing deficit per se. [Research supported by NIDCD.

  20. New venture creation as emerging interdependencies

    DEFF Research Database (Denmark)

    van Oorschot, Robin; Gottlieb, Frederik

    2015-01-01

    What is ‘it’ which actually takes place in the process of the creation of a new venture? Traditional research would focus on the creation of ‘the product’ or the venture. In this paper, we focus on the creation of ‘new meaning’ and emerging interdependencies between people in the process of new...... venture creation. Taking on an auto- ethnographic approach we co-construct, describe and analyse two narratives which on different levels, explore the notion of interdependency emerging in the process of creating a new venture. In our narrative approach we channel our new venture creation research...

  1. Clean induced feature CD shift of EUV mask

    Science.gov (United States)

    Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

    2016-05-01

    EUV developed in the last decade to the most promising Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber

  2. Phonon creation by gravitational waves

    CERN Document Server

    Sabín, Carlos; Ahmadi, Mehdi; Fuentes, Ivette

    2014-01-01

    We show that gravitational waves create phonons in a Bose-Einstein condensate (BEC). A traveling spacetime distortion produces particle creation resonances that correspond to the dynamical Casimir effect in a BEC phononic field contained in a cavity-type trap. We propose to use this effect to detect gravitational waves. The amplitude of the wave can be estimated applying recently developed relativistic quantum metrology techniques. We provide the optimal precision bound on the estimation of the wave's amplitude. Finally, we show that the parameter regime required to detect gravitational waves with this technique is within experimental reach.

  3. Knowledge Creation Through Development Projects

    DEFF Research Database (Denmark)

    Laursen, Erik

    2010-01-01

    or implemented by the organization during the projects to the routine activities of the organization after the finishing of projects ?. In the paper a typology of development projects is presented and discussed as different ways of framing the organizational learning processes, The paper is based on an empirical....... The theoretical frame of analysis has references to Nanoka & Takeuchi (knowledge creation through the transformation of the forms of the knowledge), Argyris and Ellström (the distinction between modes of correction and modes of development) ....

  4. Knowledge Sharing is Knowledge Creation

    DEFF Research Database (Denmark)

    Greve, Linda

    2015-01-01

    Knowledge sharing and knowledge transfer are important to knowledge communication. However when groups of knowledge workers engage in knowledge communication activities, it easily turns into mere mechanical information processing despite other ambitions. This article relates literature of knowledge...... reducing complexity and dividing knowledge into to dichotomies or hierarchies, knowledge workers should be enabled to use different strategies for knowledge sharing, -transfer and –creation depending on the task and the nature of the knowledge. However if the ambition is to have a strategy for sharing...

  5. Pair creation and plasma oscillations.

    Energy Technology Data Exchange (ETDEWEB)

    Prozorkevich, A. V.; Vinnik, D. V.; Schmidt, S. M.; Hecht, M. B.; Roberts, C. D.

    2000-12-15

    We describe aspects of particle creation in strong fields using a quantum kinetic equation with a relaxation-time approximation to the collision term. The strong electric background field is determined by solving Maxwell's equation in tandem with the Vlasov equation. Plasma oscillations appear as a result of feedback between the background field and the field generated by the particles produced. The plasma frequency depends on the strength of the initial background fields and the collision frequency, and is sensitive to the necessary momentum-dependence of dressed-parton masses.

  6. Value Creation in Cryptocurrency Networks

    DEFF Research Database (Denmark)

    Kazan, Erol; Tan, Chee-Wee; Lim, Eric T. K.

    2015-01-01

    advances a unified theoretical framework for identifying and investigating how cryptocurrency companies configure value through digital business models. This framework is then employed, via multiple case studies, to examine digital business models of companies within the bitcoin network. Findings suggest...... that companies within the bitcoin network exhibits six generic digital business models. These six digital business models are in turn driven by three modes of value configurations with their own distinct logic for value creation and mechanisms for value capturing. A key finding of this study is that value...

  7. Optical inspection of EPL stencil masks

    Science.gov (United States)

    Lee, Po-Tung; Engelstad, Roxann L.; Lovell, Edward G.; Kawata, Shintaro; Hirayanagi, Noriyuki; Sogard, Michael R.

    2003-06-01

    We are now at a major junction in lithography where non-optical lithographies, such as Electron Projection Lithography (EPL) [1], are being introduced. The mask used in EPL is a non-transparent silicon substrate with a thin silicon (~2μm) membrane with openings for electrons to pass through acting as a scatterer. This must be inspected as defects may cause printable defects. Initial mask inspection work has used SEM inspection to find these defects. However, we have historically used optical mask inspection tools, utilising wavelengths at or above what we are using for imaging, to qualify masks. This technology has been increasingly difficult to sustain as we have moved from imaging using mercury lamp based sources to pulsed excimer laser based sources that are not very suited to the inspection imaging. Indeed, review of defects found has moved from optical microscopes to SEM based tools. Inspection tools have also evolved, with the first SEM based mask inspection tools being developed to find the smallest defects, however these have the penalty of very low throughput. We will show the potential of using optical systems for the transmissive inspection of these EPL masks. The high potential of existing tools will be shown together with the need for a next generation of inspection tools. We will show that simulations indicate that an inspection source with 193nm wavelength would be required for the detection of 50nm defects on a mask used to print 70nm dense lines. It will also be shown how the position of the defect within the membrane greatly influences detection as well as the implications of moving to a thinner silicon membrane.

  8. Performance evaluation of selected n95 respirators and surgical masks when challenged with aerosolized endospores and inert particles.

    Science.gov (United States)

    Davidson, Craig S; Green, Christopher F; Gibbs, Shawn G; Schmid, Kendra K; Panlilio, Adelisa L; Jensen, Paul A; Scarpino, Pasquale V

    2013-01-01

    The objective of this study was to assess how the relative efficiency of N95 respirators and surgical masks might vary with different challenge aerosols, utilizing a standardized manikin head form as a surrogate to human participation. A Collision nebulizer aerosolized B. anthracis Sterne strain endospores and polystyrene latex (PSL) particles to evaluate 11 models of N95 respirators and surgical masks. An automated breathing simulator, calibrated to normal tidal volume and active breathing rate, mimicked human respiration. A manikin head form with N95 respirators or surgical masks, and manikin head form without N95 respirators or surgical masks were placed in the bioaerosol chamber. An AGI-30 sampler filled with phosphate buffered water was fitted behind the mouth of each manikin head form to collect endospore bioaerosol samples. PSL aerosols concentrations were quantified by an ARTI Hand Held Particle Counter. Geometric Mean (GM) relative efficiency of N95 respirators and surgical masks challenged with endospore bioaerosol ranged from 34-65%. In PSL aerosol experiments, GM relative efficiency ranged from 35-64% for 1.3 μm particles. GM filtration efficiency of all N95 and surgical N95 respirators filter media evaluated was ≥99% when challenged with particles ≥0.1 μm. GM filtration efficiency of surgical mask filter media ranged from 70-83% with particles ≥0.1 μm and 74-92% with 1.3 μm PSL particles. Relative efficiencies of N95 respirators and surgical masks challenged with aerosolized B. anthracis endospores and PSL were similar. Relative efficiency was similar between N95 respirators and surgical masks on a manikin head form despite clear differences in filtration efficiency. This study further highlights the importance of face seal leakage in the respiratory protection provided by N95 respirators, and demonstrates it on a human surrogate.

  9. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  10. An etching mask and a method to produce an etching mask

    DEFF Research Database (Denmark)

    2016-01-01

    The present invention relates to an etching mask comprising silicon containing block copolymers produced by self-assembly techniques onto silicon or graphene substrate. Through the use of the etching mask, nanostructures having long linear features having sub-10 nm width can be produced....

  11. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  12. Tissue Counter Analysis of Histologic Sections of Melanoma: Influence of Mask Size and Shape, Feature Selection, Statistical Methods and Tissue Preparation

    Directory of Open Access Journals (Sweden)

    Josef Smolle

    2002-01-01

    reported for manual measurements. The test sets obtained from different laboratories yielded comparable results. Conclusions: Large, square measuring masks, colour features and CART analysis provide a useful setting for the automated measurement of melanoma tissue in tissue counter analysis, which can also be used for slides derived from different laboratories.

  13. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  14. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  15. OPC aware mask and wafer metrology

    Science.gov (United States)

    Maurer, Wilhelm; Wiaux, Vincent; Jonckheere, Rik M.; Philipsen, Vicky; Hoffmann, Thomas; Verhaegen, Staf; Ronse, Kurt G.; England, Jonathan G.; Howard, William B.

    2002-08-01

    Lithography at its limit of resolution is a highly non- linear pattern transfer process. Typically the shapes of printed features deviate considerably from their corresponding features in the layout. This deviation is known as Optical Proximity Effect, and its correction Optical Proximity effect Correction or OPC. Although many other so-called optical enhancement technologies are applied to cope with the issues of lithography at its limit of resolution, almost none of these can re-store the linearity of the pattern transfer. Hence fully functional OPC has become a very basic requirement for current and future lithography processes. In general, proximity effects are two-dimensional (2d) effects. Thus any measurement of proximity effects or any characterization of the effectiveness of OPC has to be two- dimensional. As OPC modifies shapes in the data for mask writing in a way to compensate for the expected proximity effects of the following processing steps, parameters describing the particular OPC-mask quality is a major concern. One-dimensional mask specifications, such as linewidth mean-to-target and uniformity, pattern placement, and maximum size of a tolerable defect, are not sufficient anymore to completely describe the functionality of a given mask for OPC. Two-dimensional mask specifications need to be evaluated. We present in this paper a basic concept for 2d metrology. Examples for 2d measurements to assess the effectiveness of OPC are given by the application of an SEM Image Analysis tool to an advanced 130nm process.

  16. Not All Masks Are Created Equal: Masking Success in Clinical Trials of Children and Adolescents.

    Science.gov (United States)

    Jones, Lauren; Black, Sarah R; Arnold, L Eugene; Fristad, Mary A

    2017-07-17

    The current study assessed the success of masking omega-3 (Ω3) and psychotherapy in clinical trials of youth with depression or bipolar spectrum disorder. Participants were youth ages 7-14 with DSM-IV-TR diagnosed depressive (n = 72) or bipolar spectrum (n = 23) disorders. Inclusion diagnoses were depressive disorder, cyclothymic disorder, or bipolar disorder not otherwise specified. Exclusion diagnoses included bipolar I or II disorder, chronic medical condition or autism. Youth participated in 2 × 2 randomized controlled trials, in which they received Ω3 or placebo (PBO) and psychoeducational psychotherapy (PEP) or active monitoring (AM). Participants and study staff (including independent interviewers) were masked to Ω3/PBO allocation. Besides the masked independent interviewers, one coprincipal investigator (Co-PI) was fully masked to both conditions and completed all consensus conference ratings postrandomization. At the endpoint assessment or last completed interview, interviewers and the masked Co-PI guessed whether each child was assigned to Ω3 or PBO and to PEP or AM. Masking failure was calculated using the degree of correct guesses above chance level using binomial tests across all participants for Ω3 versus PBO and PEP versus AM. For all guessers, Ω3 allocation was guessed correctly approximately half the time (50%-52.5%). Rates of correct guessing were higher for PEP, but only the interviewer guesses were correct significantly more often (58.5%-68.7%) than chance. Reporting of masking success should be an essential element of RCTs. Psychotherapy is generally more difficult to mask, but with attentive masking procedures reasonable masking can be achieved.

  17. AUTOMATION OF CHAMPAGNE WINES PROCESS IN SPARKLING WINE PRESSURE TANK

    Directory of Open Access Journals (Sweden)

    E. V. Lukyanchuk

    2016-08-01

    Full Text Available The wine industry is now successfully solved the problem for the implementation of automation receiving points of grapes, crushing and pressing departments installation continuous fermentation work, blend tanks, production lines ordinary Madeira continuously working plants for ethyl alcohol installations champagne wine in continuous flow, etc. With the development of automation of technological progress productivity winemaking process develops in the following areas: organization of complex avtomatization sites grape processing with bulk transportation of the latter; improving the quality and durability of wines by the processing of a wide applying wine cold and heat, as well as technical and microbiological control most powerful automation equipment; the introduction of automated production processes of continuous technical champagne, sherry wine and cognac alcohol madery; the use of complex automation auxiliary production sites (boilers, air conditioners, refrigeration unitsand other.; complex avtomatization creation of enterprises, and sites manufactory bottling wines. In the wine industry developed more sophisticated schemes of automation and devices that enable the transition to integrated production automation, will create, are indicative automated enterprise serving for laboratories to study of the main problems of automation of production processes of winemaking.

  18. Particle Creation in Bouncing Cosmologies

    CERN Document Server

    Celani, Diogo C F; Vitenti, Sandro D P

    2016-01-01

    We investigate scalar particle creation in a set of bouncing models where the bounce occurs due to quantum cosmological effects described by the Wheeler-DeWitt equation. The scalar field can be either conformally or minimally coupled to gravity, and it can be massive or massless, without self interaction. The analysis is made for models containing a single radiation fluid, and for the more realistic case of models containing the usual observed radiation and dust fluids, which can fit most of the observed features of our Universe, including an almost scale invariant power spectrum of scalar cosmological perturbations. In the conformal coupling case, the particle production is negligible. In the minimal coupling case, for massive particles, the results point to the same physical conclusion within observational constraints: particle production is most important at the bounce energy scale, and it is not sensitive neither to its mass nor whether there is dust in the background model. The only caveat is the case wh...

  19. Remote creation of quantum coherence

    Science.gov (United States)

    Ma, Teng; Zhao, Ming-Jing; Fei, Shao-Ming; Long, Gui-Lu

    2016-10-01

    We study remote creation of coherence (RCC) for a quantum system, A, with the help of quantum operations on another system, B, and one-way classical communication. We show that all the nonincoherent quantum states are useful for RCC and all the incoherent-quantum states are not. The necessary and sufficient conditions of RCC for the quantum operations on system B are presented for pure states. The upper bound of average RCC is derived, giving a relation among the entanglement (concurrence), the RCC of the given quantum state, and the RCC of the corresponding maximally entangled state. Moreover, for two-qubit systems we find a simple factorization law for the average remote-created coherence.

  20. Analysing performance through value creation

    Directory of Open Access Journals (Sweden)

    Adrian TRIFAN

    2015-12-01

    Full Text Available This paper draws a parallel between measuring financial performance in 2 variants: the first one using data offered by accounting, which lays emphasis on maximizing profit, and the second one which aims to create value. The traditional approach to performance is based on some indicators from accounting data: ROI, ROE, EPS. The traditional management, based on analysing the data from accounting, has shown its limits, and a new approach is needed, based on creating value. The evaluation of value based performance tries to avoid the errors due to accounting data, by using other specific indicators: EVA, MVA, TSR, CVA. The main objective is shifted from maximizing the income to maximizing the value created for shareholders. The theoretical part is accompanied by a practical analysis regarding the creation of value and an analysis of the main indicators which evaluate this concept.

  1. Facilitating Value Co-Creation

    DEFF Research Database (Denmark)

    Veith, Anne; Assaf, Albert; Josiassen, Alexander

    2013-01-01

    ) introduced a new dominant logic in the marketing literature, the Service-Dominant Logic (S-D Logic), in which service, interactions, and enhanced experiences help create value, and this potential for value is what attracts consumers. Therefore organizations must be customer-centric in order to facilitate...... unique, positive experiences. As the name indicates, both organizations and consumers (should) obtain value when co-creating, which is why both parties are willing to increase their degree of involvement, e.g. spending more resources, sharing tacit knowledge, etc., because a high degree of involvement....... Through an exploratory qualitative study, 9 facilitators for B2C value co-creation were uncovered. The study was set in the creative industries. The 9 facilitators are a combination of the main facilitators found in the literature review and the ones found through the empirical research. The 9...

  2. Value Creation in Cryptocurrency Networks

    DEFF Research Database (Denmark)

    Kazan, Erol; Tan, Chee-Wee; Lim, Eric T. K.

    2015-01-01

    -chain and value-network driven business models commercialize their products and services for each value unit transfer, whereas commercialization for value-shop driven business models is realized through the subsidization of direct users by revenue generating entities. This study contributes to extant literature...... advances a unified theoretical framework for identifying and investigating how cryptocurrency companies configure value through digital business models. This framework is then employed, via multiple case studies, to examine digital business models of companies within the bitcoin network. Findings suggest...... that companies within the bitcoin network exhibits six generic digital business models. These six digital business models are in turn driven by three modes of value configurations with their own distinct logic for value creation and mechanisms for value capturing. A key finding of this study is that value...

  3. Communication masking in marine mammals: A review and research strategy.

    Science.gov (United States)

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals.

  4. Coherent Diffractive Imaging Using Randomly Coded Masks

    CERN Document Server

    Seaberg, Matthew H; Turner, Joshua J

    2015-01-01

    Coherent diffractive imaging (CDI) provides new opportunities for high resolution X-ray imaging with simultaneous amplitude and phase contrast. Extensions to CDI broaden the scope of the technique for use in a wide variety of experimental geometries and physical systems. Here, we experimentally demonstrate a new extension to CDI that encodes additional information through the use of a series of randomly coded masks. The information gained from the few additional diffraction measurements removes the need for typical object-domain constraints; the algorithm uses prior information about the masks instead. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments. Diffraction patterns are collected with up to 15 different masks placed between a CCD detector and a single sample. Phase retrieval is performed using a convex relaxation routine known as "PhaseCut" followed by a variation on Fienup's input-output algorit...

  5. Improved Mask Protected DES using RSA Algorithm

    Directory of Open Access Journals (Sweden)

    Asha Latha S.

    2016-01-01

    Full Text Available The data encryption standard is a pioneering and farsighted standard which helped to set a new paradigm for encryption standards. But now DES is considered to be insecure for some application. Asymmetric mask protected DES is an advanced encryption method for effectively protecting the advanced DES. There are still probabilities to improve its security. This paper propose a method, which introduce a RSA key generation scheme in mask protected DES instead of plain key, which result in enhancement in the security of present asymmetric mask protected DES. We further propose a Vedic mathematical method of RSA implementation which reduce the complexity of computation in RSA block thereby resulting in reduced delay (four timesthat improves the performance of overall system. The software implementation was performed using Xilinx 13.2 and Model-Sim was used for the simulation environment.

  6. Metacontrast masking is processed before grapheme-color synesthesia.

    Science.gov (United States)

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  7. Open-standards rich media mobile platform & rapid deployment service creation tool

    OpenAIRE

    Cody, RL; Tsekleves, E; Cosmas, J

    2008-01-01

    This paper builds upon the work carried out by Brunel University in the field of "Fast Prototyping And Semi-automated User Interface And Application Generation for Converged Broadcast and Cellular Terminals" [1]. This work involved the development of a service creation application for interactive services on mobile devices and methodologies and tools to speed up and deskill the deployment process. This paper aims at further enhancing these tools and presents an enhanced open standards referen...

  8. Further beyond: registration and overlay control enhancements for optical masks

    Science.gov (United States)

    Gorhad, Kujan; Cohen, Avi; Avizemer, Dan; Dmitriev, Vladimir; Beyer, Dirk; Degel, Wolfgang; Kirsch, Markus

    2014-10-01

    Mask registration control is one of the key performance specifications during the mask qualification process. It is becoming an important factor for yield improvement with the continuously tightening registration specs driven by tight wafer overlay specs. Understanding the impact of miss classified masks on the final wafer yield is gaining more and more attention, especially with the appearance of Multiple Patterning Technologies, where mask to mask overlay effect on wafer is heavily influenced by mask registration. ZEISS has established a promising closed loop solution implemented in the mask house, where the PROVE® system - a highly accurate mask registration and overlay metrology measurement tool, is being used to feed the RegC® - a registration and mask to mask overlay correction tool that can also accurately predict the correction potential in advance. The well-established RegC® process typically reaches 40-70% improvement of the mask registration/overlay error standard deviation. The PROVE® - RegC® closed loop solution has several advantages over alternative registration control methods apart of the mask re-write saving. Among the advantages is the capability to correct for pellicle mounting registration effects without the need to remove the pellicle. This paper will demonstrate improved method for enhanced mask to mask overlay control based on a new scheme of data acquisition and performance validation by the PROVE®. The mask registration data as well as additional mask information will be used to feed the RegC® correction process. Significantly improved mask to mask overlay correction results will be discussed and presented in details.

  9. Money creation in a random matching model

    OpenAIRE

    Alexei Deviatov

    2004-01-01

    I study money creation in versions of the Trejos-Wright (1995) and Shi (1995) models with indivisible money and individual holdings bounded at two units. I work with the same class of policies as in Deviatov and Wallace (2001), who study money creation in that model. However, I consider an alternative notion of implementability–the ex ante pairwise core. I compute a set of numerical examples to determine whether money creation is beneficial. I find beneficial e?ects of money creation if indiv...

  10. Use of ILT-based mask optimization for local printability enhancement

    Science.gov (United States)

    Tritchkov, Alexander; Kobelkov, Sergey; Rodin, Sergei; Sakajiri, Kyohei; Egorov, Evgueni; Woo, Soung-Su

    2014-07-01

    In this paper we study the trade-offs and benefits of using ILT-based SRAF placement/OPC over conventional SRAF placement/OPC for various front-end and back-end design configurations on a full chip. We explore the use models and benefits of using ILT-based Local Printability Enhancement (LPE) in an automated flow to eliminate hot spots that can be present on the full chip after conventional SRAF placement/OPC. We study the impact on process-window, performance, and mask manufacturability.

  11. Advances in mask fabrication and alignment for masked ion-beam lithography

    Science.gov (United States)

    Stumbo, David P.; Damm, George A.; Engler, D. W.; Fong, F. O.; Sen, S.; Wolfe, John C.; Randall, John N.; Mauger, Phillip E.; Shimkunas, Alex R.; Loeschne, Hans

    1990-05-01

    This paper describes recent developments in three areas ofmasked ion beam lithography (MIBL). These are 1) fabrication oflarge area, low distortion, silicon stencilmasks for demagnifying ion projection lithography, 2) fabrication ofstencil masks with nanometer scale resolution for 1:1 proximity printing, and 3) development of a direct method of alignment using the ion beam induced fluorescence of Si02. These topics are discussed below. Demagnifying ion projection masks: We describe the fabrication of stencil masks in large area, low stress (10 MPa), n-type silicon membranes. The projection masks have a silicon foil area 95 mm in diameter, thicknesses between 1.5-5 and resolution of0.6um. Measured distortion (3a) in the IPL masks ranges between 0.23gm and 0.65,um, with an experimental error of 0.20 1um. Proximity printing masks: A process is described for fabricating stencil masks with 50 nm resolution in low stress, n-type silicon membranes. Membranes less than 0.5 ,ttm thick are shown to be free of the sidewall taper that limits resolution in thicker masks. These thin membranes show a slightly flared profile due to the imperfectly collimated etching ions. Alignment: A direct method of alignment is being developed which uses the ion beam induced fluorescence of Si02 marks. Fluorescence yield is characterized as a function of ion energy and resist coating thickness. The yield for Si02 is in the range between 0.1-1.0 photons/proton, while the yields for Si, Al, and photoresist are negligibly small. Thus, a simple alignment technique can be implemented where registration of a grating in the mask with a corresponding oxide pattern is detected as a fluorescence maximum. A simple model predicts that 50 nm alignment can be accomplished, following a 1 im prealignment, in 2 seconds.

  12. Manufacturing and automation

    Directory of Open Access Journals (Sweden)

    Ernesto Córdoba Nieto

    2010-04-01

    Full Text Available The article presents concepts and definitions from different sources concerning automation. The work approaches automation by virtue of the author’s experience in manufacturing production; why and how automation prolects are embarked upon is considered. Technological reflection regarding the progressive advances or stages of automation in the production area is stressed. Coriat and Freyssenet’s thoughts about and approaches to the problem of automation and its current state are taken and examined, especially that referring to the problem’s relationship with reconciling the level of automation with the flexibility and productivity demanded by competitive, worldwide manufacturing.

  13. Cosmic Ballet or Devil's Mask?

    Science.gov (United States)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  14. Sunglint Detection for Unmanned and Automated Platforms

    Directory of Open Access Journals (Sweden)

    Oliver Zielinski

    2012-09-01

    Full Text Available We present an empirical quality control protocol for above-water radiometric sampling focussing on identifying sunglint situations. Using hyperspectral radiometers, measurements were taken on an automated and unmanned seaborne platform in northwest European shelf seas. In parallel, a camera system was used to capture sea surface and sky images of the investigated points. The quality control consists of meteorological flags, to mask dusk, dawn, precipitation and low light conditions, utilizing incoming solar irradiance (ES spectra. Using 629 from a total of 3,121 spectral measurements that passed the test conditions of the meteorological flagging, a new sunglint flag was developed. To predict sunglint conspicuous in the simultaneously available sea surface images a sunglint image detection algorithm was developed and implemented. Applying this algorithm, two sets of data, one with (having too much or detectable white pixels or sunglint and one without sunglint (having least visible/detectable white pixel or sunglint, were derived. To identify the most effective sunglint flagging criteria we evaluated the spectral characteristics of these two data sets using water leaving radiance (LW and remote sensing reflectance (RRS. Spectral conditions satisfying ‘mean LW (700–950 nm < 2 mW∙m−2∙nm−1∙Sr−1’ or alternatively ‘minimum RRS (700–950 nm < 0.010 Sr−1’, mask most measurements affected by sunglint, providing an efficient empirical flagging of sunglint in automated quality control.

  15. Knowledge acquisition and creation in the high-tech industry

    Directory of Open Access Journals (Sweden)

    Juliano Pavanelli Stefanovitz

    2007-10-01

    Full Text Available This paper explores the new challenges that come with the emergence of knowledge-based approaches on organizational studies. It is widely recognized, in this context, the increasing importance of understanding the processes through which companys acquire, storage, disseminate and create knowledge. This research analysis the knowledge creation and external acquisition processes in the high-tech industry, environment in which intensive use of knowledge is made. For that, it presents a case study of an R&D Division of a company present in the industrial automation market. In recognition of its innovative competence, this company won the FINEP Prize – Technological Innovation. In this study, besides the identification of the main external knowledge sources, an analysis of the knowledge types conversion observed in its product development activities is made.

  16. Skeleton-based OPC application for DSA full chip mask correction

    Science.gov (United States)

    Schneider, L.; Farys, V.; Serret, E.; Fenouillet-Beranger, C.

    2015-09-01

    Recent industrial results around directed self-assembly (DSA) of block copolymers (BCP) have demonstrated the high potential of this technique [1-2]. The main advantage being cost reduction thanks to a reduced number of lithographic steps. Meanwhile, the associated correction for mask creation must account for the introduction of this new technique, maintaining a high level of accuracy and reliability. In order to create VIA (Vertical Interconnect Layer) layer, graphoepitaxy DSA can be used. The technique relies on the creation of a confinement guides where the BCP can separate into distinct regions and resulting patterns are etched in order to obtain an ordered series of VIA contact. The printing of the guiding pattern requires the use of classical lithography. Optical proximity correction (OPC) is applied to obtain the best suited guiding pattern allowing to match a specific design target. In this study, an original approach for DSA full chip mask optical proximity correction based on a skeleton representation of a guiding pattern is proposed. The cost function for an OPC process is based on minimizing the Central Placement Error (CPE), defined as the difference between an ideal skeleton target and a generated skeleton from a guiding contour. The high performance of this approach for DSA OPC full chip correction and its ability to minimize variability error on via placement is demonstrated and reinforced by the comparison with a rigorous model. Finally this Skeleton approach is highlighted as an appropriate tool for Design rules definition.

  17. Adaptation to different noninvasive ventilation masks in critically ill patients

    Directory of Open Access Journals (Sweden)

    Renata Matos da Silva

    2013-06-01

    Full Text Available OBJECTIVE: To identify which noninvasive ventilation (NIV masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%. Total face masks were the most commonly used (in 74.7%, followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively. Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

  18. A new approach for defect inspection on large area masks

    Science.gov (United States)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  19. Defect printability in CPL mask technology

    Science.gov (United States)

    Kuijten, Jan-Pieter; Verhappen, Arjan; Pijnenburg, Wil; Conley, Will; Litt, Lloyd C.; Wu, Wei; Montgomery, Patrick; Roman, Bernard J.; Kasprowicz, Bryan S.; Progler, Christopher J.; Socha, Robert J.; Van Den Broeke, Douglas J.; Schaefer, Erika; Cook, Pat

    2004-05-01

    Each generation of semiconductor device technology drive new and interesting resolution enhancement technology (RET"s). The race to smaller and smaller geometry"s has forced device manufacturers to k1"s approaching 0.40. The authors have been investigating the use of Chromeless phase-shifting masks (CPL) exposed with ArF, high numerical aperture (NA), and off-axis illumination (OAI) has been shown to produce production worthy sub-100nm resist patterns with acceptable overlapped process window across feature pitch. These new reticle technologies have many issues that are similar to simple binary masks. The authors have investigated the printability of defects in CPL mask technology. Programmed defects of various sizes and types have been simulated and printed for sub 100nm imaging. High resolution scanning electron microscopy has been used to characterize these defects and develop an understanding of size and type that prints. In this paper the authors will focus on image line end shortening and the impact of through dose and focus performance for very high NA ArF imaging. The authors have built a number of test structures that require superior 2D control for SRAM gate structures. Various types of line ends have been evaluated for either straight CPL mask or hybrid type builds.

  20. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  1. The fastest saccadic responses escape visual masking.

    Directory of Open Access Journals (Sweden)

    Sébastien M Crouzet

    Full Text Available Object-substitution masking (OSM occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. The reduction of target visibility occurring after OSM has been suggested to result from a specific interference with reentrant visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task, which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference under either OSM or backward masking, as they did under the low-contrast condition. This finding supports the hypothesis that masking interferes mostly with reentrant processing at later stages, while leaving early feedforward processing largely intact.

  2. The laryngeal mask airway at altitude.

    Science.gov (United States)

    Wilson, Grant D; Sittig, Steven E; Schears, Gregory J

    2008-02-01

    The Laryngeal Mask Airway (LMA) is an accepted adjunct for airway management in emergency patients. There are a number of case reports describing its use in transport medicine for infant to adult patients, including during flight. Although studies of the effect altitude has on air-filled tracheal tubes exists, we were unable to find documentation of the effect of altitude on laryngeal mask airways. Our objective was to assess the effect of altitude on the LMA in both fixed wing and rotary wing models. We performed an in vitro study of the effect of altitude on the LMA cuff. Infant and adult airway trainer mannequins with properly sized and inserted LMA-Classic laryngeal mask airways were monitored for cuff pressure changes while flown at altitudes commonly encountered during air medical transport. Both models demonstrated that LMA cuff pressures may exceed manufacturer recommended levels for safe use even at the relatively low altitudes experienced during rotor wing flight. Properly inserted and inflated laryngeal mask airways at ground level may result in overinflated LMA cuffs when flown to altitudes commonly used for rotor and fixed wing medical transport unless monitored and corrected.

  3. Posleslovije k "Zolotoi maske" / Boris Tuch

    Index Scriptorium Estoniae

    Tuch, Boris, 1946-

    2005-01-01

    Vene draamafestivali "Kuldne mask Eestis" lavastusest : "September.doc", lav. Mihhail Ugarov, I. Võrõpajevi "Hapnik" lav. Viktor Rõzhakov Teatr.doc esituses, Sophoklese "Kuningas Oidipus" lav. Andrei Prikotenko Peterburi Teatri Liteinõi esituses, M. Ugarovi lavastus "OblomOFF"

  4. Testing Tactile Masking between the Forearms.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2016-02-10

    Masking, in which one stimulus affects the detection of another, is a classic technique that has been used in visual, auditory, and tactile research, usually using stimuli that are close together to reveal local interactions. Masking effects have also been demonstrated in which a tactile stimulus alters the perception of a touch at a distant location. Such effects can provide insight into how components of the body's representations in the brain may be linked. Occasional reports have indicated that touches on one hand or forearm can affect tactile sensitivity at corresponding contralateral locations. To explore the matching of corresponding points across the body, we can measure the spatial tuning and effect of posture on contralateral masking. Careful controls are required to rule out direct effects of the remote stimulus, for example by mechanical transmission, and also attention effects in which thresholds may be altered by the participant's attention being drawn away from the stimulus of interest. The use of this technique is beneficial as a behavioural measure for exploring which parts of the body are functionally connected and whether the two sides of the body interact in a somatotopic representation. This manuscript describes a behavioural protocol that can be used for studying contralateral tactile masking.

  5. Chromium Contamination in Army Face Masks.

    Science.gov (United States)

    1989-01-01

    containing carbon particles by inhalation when wearing face masks. Other potential health effects are chrome allergies and nonneoplastic lesions of...chronic inflammation—have been reported in chrome -platers and other workers exposed to aerosols of chromium (VI) compounds. Chronic pharyngitis...monochromates and dichromates of sodium, potassium , ammonium, lithium, cesium, and rubidium. ACGIH includes chromium in its list of known human

  6. TASTE MASKING IN PHARMACEUTICAL: AN UPDATE

    Directory of Open Access Journals (Sweden)

    Srivastava Saurabh

    2012-08-01

    Full Text Available Taste is an important factor in the development of dosage form. Nevertheless it is that arena of product development that has been overlooked and undermined for its importance. The problem of bitter and obnoxious taste of is a challenge to the pharmacist in the present scenario. Taste is an important parameter governing compliance. Several oral pharmaceuticals and bulking agents have unpleasant, bitter-tasting components. In numerous cases, the bitter taste modality is an undesirable trait of the product or formulations and can considerably affect its acceptability by consumers. Bitter characteristics found in such systems have been eliminated or minimized by various known processes, but no universally applicable technology for bitterness inhibition has ever been recognized. The desire of improved palatability in these products has prompted the development of numerous formulations with improved performance and acceptability Taste masking technologies offer a great scope for invention and patents. Several approaches like adding flavors and sweeteners, use of coating polymers for inhibiting bitterness, microencapsulation, prodrug formation, formation of inclusion and molecular complexes, solid dispersion system, addition of effervescent agents and application of ion exchange resins have been tried by the formulators to mask the unpleasant taste of the bitter drugs. The present review attempts to give a brief account of different technologies of taste masking with respect to dosage form and novel methods of evaluation of taste masking effect.

  7. Mask cycle time reduction for foundry projects

    Science.gov (United States)

    Balasinski, A.

    2011-11-01

    One of key deliverables of foundry based manufacturing is low cycletime. Building new and enhancing existing products by mask changes involves significant logistical effort, which could be reduced by standardizing data management and communication procedures among design house, mask shop, and foundry (fab) [1]. As an example, a typical process of taping out can take up to two weeks in addition to technical effort, for database handling, mask form completion, management approval, PO signoff and JDV review, translating into loss of revenue. In order to reduce this delay, we are proposing to develop a unified online system which should assist with the following functions: database edits, final verifications, document approvals, mask order entries, and JDV review with engineering signoff as required. This would help a growing number of semiconductor products to be flexibly manufactured at different manufacturing sites. We discuss how the data architecture based on a non-relational database management system (NRDMBS) extracted into a relational one (RDMBS) should provide quality information [2], to reduce cycle time significantly beyond 70% for an example 2 week tapeout schedule.

  8. Masked object registration in the Fourier domain.

    Science.gov (United States)

    Padfield, Dirk

    2012-05-01

    Registration is one of the most common tasks of image analysis and computer vision applications. The requirements of most registration algorithms include large capture range and fast computation so that the algorithms are robust to different scenarios and can be computed in a reasonable amount of time. For these purposes, registration in the Fourier domain using normalized cross-correlation is well suited and has been extensively studied in the literature. Another common requirement is masking, which is necessary for applications where certain regions of the image that would adversely affect the registration result should be ignored. To address these requirements, we have derived a mathematical model that describes an exact form for embedding the masking step fully into the Fourier domain so that all steps of translation registration can be computed efficiently using Fast Fourier Transforms. We provide algorithms and implementation details that demonstrate the correctness of our derivations. We also demonstrate how this masked FFT registration approach can be applied to improve the Fourier-Mellin algorithm that calculates translation, rotation, and scale in the Fourier domain. We demonstrate the computational efficiency, advantages, and correctness of our algorithm on a number of images from real-world applications. Our framework enables fast, global, parameter-free registration of images with masked regions.

  9. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  10. Open string pair creation from worldsheet instantons

    Energy Technology Data Exchange (ETDEWEB)

    Schubert, Christian [Max-Planck-Institut fuer Gravitationsphysik, Albert-Einstein-Institut, Muehlenberg 1, D-14476 Potsdam (Germany); Torrielli, Alessandro [Institute for Theoretical Physics and Spinoza Institute, Utrecht University, Leuvenlaan 4, 3584 CE Utrecht (Netherlands)

    2010-10-08

    Worldline instantons provide a particularly elegant way to derive Schwinger's well-known formula for the pair creation rate due to a constant electric field in quantum electrodynamics. In this communication, we show how to extend this method to the corresponding problem of open string pair creation. (fast track communication)

  11. Quantum Creation of Topological Black Hole

    CERN Document Server

    Wu Zhong Chao

    2000-01-01

    The constrained instanton method is used to study quantum creation of a vacuum or charged topological black hole. At the WKB level, the relative creation probability is the exponential of a quarter sum of the horizon areas associated with the seed instanton.

  12. The Future of Co-Creation

    DEFF Research Database (Denmark)

    Seppa, Marko; Tanev, Stoyan

    2011-01-01

    The objective of this article is to provide a brief summary of the key directions in value co-creation research that have emerged in the last 10 years. It points to several emerging streams in value co-creation research including: i) general management perspective; ii) new product development...

  13. Autonomy and Automation

    Science.gov (United States)

    Shively, Jay

    2017-01-01

    A significant level of debate and confusion has surrounded the meaning of the terms autonomy and automation. Automation is a multi-dimensional concept, and we propose that Remotely Piloted Aircraft Systems (RPAS) automation should be described with reference to the specific system and task that has been automated, the context in which the automation functions, and other relevant dimensions. In this paper, we present definitions of automation, pilot in the loop, pilot on the loop and pilot out of the loop. We further propose that in future, the International Civil Aviation Organization (ICAO) RPAS Panel avoids the use of the terms autonomy and autonomous when referring to automated systems on board RPA. Work Group 7 proposes to develop, in consultation with other workgroups, a taxonomy of Levels of Automation for RPAS.

  14. An automated swimming respirometer

    DEFF Research Database (Denmark)

    STEFFENSEN, JF; JOHANSEN, K; BUSHNELL, PG

    1984-01-01

    An automated respirometer is described that can be used for computerized respirometry of trout and sharks.......An automated respirometer is described that can be used for computerized respirometry of trout and sharks....

  15. Configuration Management Automation (CMA) -

    Data.gov (United States)

    Department of Transportation — Configuration Management Automation (CMA) will provide an automated, integrated enterprise solution to support CM of FAA NAS and Non-NAS assets and investments. CMA...

  16. Masks, Performing Traditions, and Cultural Diversity: Exploring African Culture through African Masks.

    Science.gov (United States)

    Cotto-Escalera, Brenda L.

    1991-01-01

    Explores the mask and masquerade traditions, focusing specifically on African culture as a source of exciting and varied materials that can help theater arts teachers and specialists who are in search of culturally diverse materials. Offers a classroom application. (PRA)

  17. Green binary and phase shifting mask

    Science.gov (United States)

    Shy, S. L.; Hong, Chao-Sin; Wu, Cheng-San; Chen, S. J.; Wu, Hung-Yu; Ting, Yung-Chiang

    2009-12-01

    SixNy/Ni thin film green mask blanks were developed , and are now going to be used to replace general chromium film used for binary mask as well as to replace molydium silicide embedded material for AttPSM for I-line (365 nm), KrF (248 nm), ArF (193 nm) and Contact/Proximity lithography. A bilayer structure of a 1 nm thick opaque, conductive nickel layer and a SixNy layer is proposed for binary and phase-shifting mask. With the good controlling of plasma CVD of SixNy under silane (50 sccm), ammonia (5 sccm) and nitrogen (100 sccm), the pressure is 250 mTorr. and RF frequency 13.56 MHz and power 50 W. SixNy has enough deposition latitude to meet the requirements as an embedded layer for required phase shift 180 degree, and the T% in 193, 248 and 365 nm can be adjusted between 2% to 20% for binary and phase shifting mask usage. Ni can be deposited by E-gun, its sheet resistance Rs is less than 1.435 kΩ/square. Jeol e-beam system and I-line stepper are used to evaluate these thin film green mask blanks, feature size less than 200 nm half pitch pattern and 0.558 μm pitch contact hole can be printed. Transmission spectrums of various thickness of SixNy film are inspected by using UV spectrometer and FTIR. Optical constants of the SixNy film are measured by n & k meter and surface roughness is inspected by using Atomic Force Microscope (AFM).

  18. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  19. Workflow automation architecture standard

    Energy Technology Data Exchange (ETDEWEB)

    Moshofsky, R.P.; Rohen, W.T. [Boeing Computer Services Co., Richland, WA (United States)

    1994-11-14

    This document presents an architectural standard for application of workflow automation technology. The standard includes a functional architecture, process for developing an automated workflow system for a work group, functional and collateral specifications for workflow automation, and results of a proof of concept prototype.

  20. Improving automated disturbance maps using snow-covered landsat time series stacks

    Science.gov (United States)

    Kirk M. Stueve; Ian W. Housman; Patrick L. Zimmerman; Mark D. Nelson; Jeremy Webb; Charles H. Perry; Robert A. Chastain; Dale D. Gormanson; Chengquan Huang; Sean P. Healey; Warren B. Cohen

    2012-01-01

    Snow-covered winter Landsat time series stacks are used to develop a nonforest mask to enhance automated disturbance maps produced by the Vegetation Change Tracker (VCT). This method exploits the enhanced spectral separability between forested and nonforested areas that occurs with sufficient snow cover. This method resulted in significant improvements in Vegetation...

  1. Task-Dependent Masked Priming Effects in Visual Word Recognition

    OpenAIRE

    Sachiko eKinoshita; Dennis eNorris

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal...

  2. Effects of the combination of mask preconditioning with midazolam pretreatment on anxiety and mask acceptance during pediatric inhalational induction and postoperative mask fear in children

    Institute of Scientific and Technical Information of China (English)

    LAN Yun-ping; HUANG Zhen-hua; G.Allen Finley; ZUO Yun-xia

    2012-01-01

    Background Anxiety and fear frequently causes an aversion to applying a face mask and increases difficulty during pediatric induction.There is at present little study of this problem.Therefore,the aim of this study was to investigate the effect of the combination of mask preconditioning and midazolam pretrealment on mask acceptance during pediatric induction and on postoperative mask fear.Methods One hundred and sixty children were randomly assigned into four groups:the mask preconditioning group (MaG),the midazolam pretreatment group (MiG),the mask/midazolam combination group (Ma/MiG),and the saline group (SaG).The Modified Yale Preoperative Anxiety Scale (m-YPAS) was employed to assess the anxiety in the operation room (OR).A Mask Acceptance Score (MAS) was measured during inhalational induction and the incidence of mask fear (MAS ≤2) was evaluated postoperatively.Results The MaG and Ma/MiG groups had the highest mask acceptance scores but there were no differences between these two groups (P <0.05).The average anxiety level of children entering the OR was much lower in the MaG and Ma/MiG groups than in the SaG group (P <0.05).During induction,the anxiety level increased in the SaG and MaG groups but decreased in the MiG and Ma/MiG groups (P <0.05).At the postoperative third day,the incidence of mask fears was as high as 23% in the SaG group,15% in the MiG group,but only 2.5% in the MaG and Ma/MiG groups.Conclusions The single use of mask preconditioning has a better influence than midazolam for increasing mask acceptance during inhalational induction and reducing postoperative mask fear,reducing the anxiety level during induction,improving induction compliance and shortening the total mask time.A mask preconditioning and midazolam combination did not increase mask acceptance during inhalational induction,reduce mask fears postoperatively,improve induction compliance,nor shorten the total mask time.But it can better reduce the anxiety level during

  3. easyDAS: Automatic creation of DAS servers

    Directory of Open Access Journals (Sweden)

    Jimenez Rafael C

    2011-01-01

    Full Text Available Abstract Background The Distributed Annotation System (DAS has proven to be a successful way to publish and share biological data. Although there are more than 750 active registered servers from around 50 organizations, setting up a DAS server comprises a fair amount of work, making it difficult for many research groups to share their biological annotations. Given the clear advantage that the generalized sharing of relevant biological data is for the research community it would be desirable to facilitate the sharing process. Results Here we present easyDAS, a web-based system enabling anyone to publish biological annotations with just some clicks. The system, available at http://www.ebi.ac.uk/panda-srv/easydas is capable of reading different standard data file formats, process the data and create a new publicly available DAS source in a completely automated way. The created sources are hosted on the EBI systems and can take advantage of its high storage capacity and network connection, freeing the data provider from any network management work. easyDAS is an open source project under the GNU LGPL license. Conclusions easyDAS is an automated DAS source creation system which can help many researchers in sharing their biological data, potentially increasing the amount of relevant biological data available to the scientific community.

  4. Does "Darkness" Lead to "Happiness"? Masked Suffix Priming Effects

    Science.gov (United States)

    Dunabeitia, Jon Andoni; Perea, Manuel; Carreiras, Manuel

    2008-01-01

    Masked affix priming effects have usually been obtained for words sharing the initial affix (e.g., "reaction"-"REFORM"). However, prior evidence on masked suffix priming effects (e.g., "baker"-"WALKER") is inconclusive. In the present series of masked priming lexical decision experiments, a target word was…

  5. How color, regularity, and good Gestalt determine backward masking.

    Science.gov (United States)

    Sayim, Bilge; Manassi, Mauro; Herzog, Michael

    2014-06-18

    The strength of visual backward masking depends on the stimulus onset asynchrony (SOA) between target and mask. Recently, it was shown that the conjoint spatial layout of target and mask is as crucial as SOA. Particularly, masking strength depends on whether target and mask group with each other. The same is true in crowding where the global spatial layout of the flankers and target-flanker grouping determine crowding strength. Here, we presented a vernier target followed by different flanker configurations at varying SOAs. Similar to crowding, masking of a red vernier target was strongly reduced for arrays of 10 green compared with 10 red flanking lines. Unlike crowding, single green lines flanking the red vernier showed strong masking. Irregularly arranged flanking lines yielded stronger masking than did regularly arranged lines, again similar to crowding. While cuboid flankers reduced crowding compared with single lines, this was not the case in masking. We propose that, first, masking is reduced when the flankers are part of a larger spatial structure. Second, spatial factors counteract color differences between the target and the flankers. Third, complex Gestalts, such as cuboids, seem to need longer processing times to show ungrouping effects as observed in crowding. Strong parallels between masking and crowding suggest similar underlying mechanism; however, temporal factors in masking additionally modulate performance, acting as an additional grouping cue. © 2014 ARVO.

  6. Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction

    Science.gov (United States)

    Hagiwara, Kazuyuki; Bork, Ingo; Fujimura, Aki

    2011-05-01

    Using Model-Based Mask Data Preparation (MB-MDP) complex masks with complex sub-resolution assist features (SRAFs) can be written in practical write times with today's leading-edge production VSB machines by allowing overlapping VSB shots. This simulation-based approach reduces shot count by taking advantage of the added flexibility in being able to overlap shots. The freedom to overlap shots, it turns out, also increases mask fidelity, CDU on the mask, and CDU on the wafer by writing sub-100nm mask features more accurately, and with better dose margin. This paper describes how overlapping shots enhance mask and wafer quality for various sub-100nm features on ArF masks. In addition, this paper describes how EUV mask accuracy can be enhanced uniquely by allowing overlapping shots.

  7. Particle creation in bouncing cosmologies

    Science.gov (United States)

    Celani, Diogo C. F.; Pinto-Neto, Nelson; Vitenti, Sandro D. P.

    2017-01-01

    We investigate scalar particle creation in a set of bouncing models where the bounce occurs due to quantum cosmological effects described by the Wheeler-DeWitt equation. The scalar field can be either conformally or minimally coupled to gravity, and it can be massive or massless, without self-interaction. The analysis is made for models containing a single radiation fluid and for the more realistic case of models containing the usual observed radiation and dust fluids, which can fit most of the observed features of our universe, including an almost scale invariant power spectrum of scalar cosmological perturbations. In the conformal coupling case, the particle production is negligible. In the minimal coupling case, for massive particles, the results point to the same physical conclusion within observational constraints: particle production is most important at the bounce energy scale, and it is not sensitive either to its mass or to whether there is dust in the background model. The only caveat is the case where the particle mass is larger than the bounce energy scale. On the other hand, the energy density of produced massive particles depend on their masses and the energy scale of the bounce. For very large masses and deep bounces, this energy density may overcome that of the background. In the case of massless particles, the energy density of produced particles can become comparable to the background energy density only for bounces occurring at energy scales comparable to the Planck scale or above, which lies beyond the scope of this paper: we expect that the simple Wheeler-DeWitt approach we are using should be valid only at scales a few orders of magnitude below the Planck energy. Nevertheless, in the case in which dust is present, there is an infrared divergence, which becomes important only for scales much larger than today's Hubble radius.

  8. Automation in Clinical Microbiology

    Science.gov (United States)

    Ledeboer, Nathan A.

    2013-01-01

    Historically, the trend toward automation in clinical pathology laboratories has largely bypassed the clinical microbiology laboratory. In this article, we review the historical impediments to automation in the microbiology laboratory and offer insight into the reasons why we believe that we are on the cusp of a dramatic change that will sweep a wave of automation into clinical microbiology laboratories. We review the currently available specimen-processing instruments as well as the total laboratory automation solutions. Lastly, we outline the types of studies that will need to be performed to fully assess the benefits of automation in microbiology laboratories. PMID:23515547

  9. Automated Liquibase Generator And ValidatorALGV

    Directory of Open Access Journals (Sweden)

    Manik Jain

    2015-08-01

    Full Text Available Abstract This paper presents an automation tool namely ALGV Automated Liquibase Generator and Validator for the automated generation and verification of liquibase scripts. Liquibase is one of the most efficient ways of applying and persisting changes to a database schema. Since its invention by Nathan Voxland 1 it has become de facto standard for database change management. The advantages of using liquibase scripts over traditional sql queries ranges from version control to reusing the same scripts over multiple database platforms. Irrespective of its advantages manual creation of liquibase scripts takes a lot of effort and sometimes is error-prone. ALGV helps to reduce the time consuming liquibase script generation manual typing efforts possible error occurrence and manual verification process and time by 75. Automating the liquibase generation process also helps to remove the burden of recollecting specific tags to be used for a particular change. Moreover developers can concentrate on the business logic and business data rather than wasting their precious efforts in writing files.

  10. Incremental learning for automated knowledge capture.

    Energy Technology Data Exchange (ETDEWEB)

    Benz, Zachary O.; Basilico, Justin Derrick; Davis, Warren Leon,; Dixon, Kevin R.; Jones, Brian S.; Martin, Nathaniel; Wendt, Jeremy Daniel

    2013-12-01

    People responding to high-consequence national-security situations need tools to help them make the right decision quickly. The dynamic, time-critical, and ever-changing nature of these situations, especially those involving an adversary, require models of decision support that can dynamically react as a situation unfolds and changes. Automated knowledge capture is a key part of creating individualized models of decision making in many situations because it has been demonstrated as a very robust way to populate computational models of cognition. However, existing automated knowledge capture techniques only populate a knowledge model with data prior to its use, after which the knowledge model is static and unchanging. In contrast, humans, including our national-security adversaries, continually learn, adapt, and create new knowledge as they make decisions and witness their effect. This artificial dichotomy between creation and use exists because the majority of automated knowledge capture techniques are based on traditional batch machine-learning and statistical algorithms. These algorithms are primarily designed to optimize the accuracy of their predictions and only secondarily, if at all, concerned with issues such as speed, memory use, or ability to be incrementally updated. Thus, when new data arrives, batch algorithms used for automated knowledge capture currently require significant recomputation, frequently from scratch, which makes them ill suited for use in dynamic, timecritical, high-consequence decision making environments. In this work we seek to explore and expand upon the capabilities of dynamic, incremental models that can adapt to an ever-changing feature space.

  11. Controlling bridging and pinching with pixel-based mask for inverse lithography

    Science.gov (United States)

    Kobelkov, Sergey; Tritchkov, Alexander; Han, JiWan

    2016-03-01

    Inverse Lithography Technology (ILT) has become a viable computational lithography candidate in recent years as it can produce mask output that results in process latitude and CD control in the fab that is hard to match with conventional OPC/SRAF insertion approaches. An approach to solving the inverse lithography problem as a nonlinear, constrained minimization problem over a domain mask pixels was suggested in the paper by Y. Granik "Fast pixel-based mask optimization for inverse lithography" in 2006. The present paper extends this method to satisfy bridging and pinching constraints imposed on print contours. Namely, there are suggested objective functions expressing penalty for constraints violations, and their minimization with gradient descent methods is considered. This approach has been tested with an ILT-based Local Printability Enhancement (LPTM) tool in an automated flow to eliminate hotspots that can be present on the full chip after conventional SRAF placement/OPC and has been applied in 14nm, 10nm node production, single and multiple-patterning flows.

  12. Constrained instanton and black hole creation

    Institute of Scientific and Technical Information of China (English)

    WU Zhongchao; XU Donghui

    2004-01-01

    A gravitational instanton is considered as the seed for the creation of a universe. However, there exist too few instantons. To include many interesting phenomena in the framework of quantum cosmology, the concept of constrained gravitational instanton is inevitable. In this paper we show how a primordial black hole is created from a constrained instanton. The quantum creation of a generic black hole in the closed or open background is completely resolved. The relation of the creation scenario with gravitational thermodynamics and topology is discussed.

  13. Interactivity, Game Creation, Design, Learning, and Innovation

    DEFF Research Database (Denmark)

    This book constitutes the proceedings of two conferences: The 5th International Conference on ArtsIT, Interactivity and Game Creation (ArtsIT 2016) and the First International Conference on Design, Learning and Innovation (DLI 2016). ArtsIT is reflecting trends in the expanding field of digital art......, interactive art, and how game creation is considered an art form. The decision was made to augment the title of ArtsIT to be in future known as “The International Conference on Interactivity, Game Creation, Design, Learning, and Innovation”. The event was hosted in Esbjerg, Denmark in May 2016 and attracted...

  14. ILT Approach for Compensating 3-D Mask Effects

    Institute of Scientific and Technical Information of China (English)

    XIONG Wei; ZHANG Jinyu; MinChun; WANG Yan; YU Zhiping

    2009-01-01

    As mask features scale to smaller dimensions,the so-called "3-D mask effects" which have mostly been neglected before,become important.This paper properly models the 3-D thick mask effects,and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results.Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94,and this approach gives improved accuracy and faster results than existing methods.

  15. The Fastest Saccadic Responses Escape Visual Masking

    DEFF Research Database (Denmark)

    M. Crouzet, Sébastien; Overgaard, Morten; Busch, Niko A.

    2014-01-01

    , which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference......Object-substitution masking (OSM) occurs when a briefly presented target in a search array is surrounded by small dots that remain visible after the target disappears. The reduction of target visibility occurring after OSM has been suggested to result from a specific interference with reentrant...... visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task...

  16. Reduced basis method for source mask optimization

    CERN Document Server

    Pomplun, J; Burger, S; Schmidt, F; Tyminski, J; Flagello, D; Toshiharu, N; 10.1117/12.866101

    2010-01-01

    Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational lithography. SMO is considered essential to extending immersion lithography beyond the 45nm node. However, SMO is computationally extremely challenging and time-consuming. The key challenges are due to run time vs. accuracy tradeoffs of the imaging models used for the computational lithography. We present a new technique to be incorporated in the SMO flow. This new approach is based on the reduced basis method (RBM) applied to the simulation of light transmission through the lithography masks. It provides a rigorous approximation to the exact lithographical problem, based on fully vectorial Maxwell's equations. Using the reduced basis method, the optimization process is divided into an offline and an online steps. In the offline step, a RBM model with variable geometrical param...

  17. Multi-part mask for implanting workpieces

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.

    2016-05-10

    A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.

  18. Masking mediated print defect visibility predictor

    Science.gov (United States)

    Jing, Xiaochen; Nachlieli, Hila; Shaked, Doron; Shiffman, Smadar; Allebach, Jan P.

    2012-01-01

    Banding is a well-known artifact produced by printing systems. It usually appears as lines perpendicular to the process direction of the print. Therefore, banding is an important print quality issue which has been analyzed and assessed by many researchers. However, little literature has focused on the study of the masking effect of content for this kind of print quality issue. Compared with other image and print quality research, our work is focused on the print quality of typical documents printed on a digital commercial printing press. In this paper, we propose a Masking Mediated Print Defect Visibility Predictor (MMPDVP) to predict the visibility of defects in the presence of customer content. The parameters of the algorithm are trained from ground-truth images that have been marked by subjects. The MMPDVP could help the press operator decide whether the print quality is acceptable for specific customer requirements. Ultimately, this model can be used to optimize the print-shop workflow.

  19. Latent inhibition in human adults without masking.

    Science.gov (United States)

    Escobar, Martha; Arcediano, Francisco; Miller, Ralph R

    2003-09-01

    Latent inhibition refers to attenuated responding to Cue X observed when the X-outcome pairings are preceded by X-alone presentations. It has proven difficult to obtain in human adults unless the preexposure (X-alone) presentations are embedded within a masking (i.e., distracting) task. The authors hypothesized that the difficulty in obtaining latent inhibition with unmasked tasks is related to the usual training procedures, in which the preexposure and conditioning experiences are separated by a set of instructions. Experiment 1 reports latent inhibition without masking in a task in which preexposure and conditioning occur without interruption. Experiments 2 and 3 demonstrate that this attenuation in responding to target Cue X does not pass a summation test for conditioned inhibition and is context specific, thereby confirming that it is latent inhibition. Experiments 3 and 4 confirm that introducing instructions between preexposure and conditioning disrupts latent inhibition.

  20. Contrast Gain Control Model Fits Masking Data

    Science.gov (United States)

    Watson, Andrew B.; Solomon, Joshua A.; Null, Cynthia H. (Technical Monitor)

    1994-01-01

    We studied the fit of a contrast gain control model to data of Foley (JOSA 1994), consisting of thresholds for a Gabor patch masked by gratings of various orientations, or by compounds of two orientations. Our general model includes models of Foley and Teo & Heeger (IEEE 1994). Our specific model used a bank of Gabor filters with octave bandwidths at 8 orientations. Excitatory and inhibitory nonlinearities were power functions with exponents of 2.4 and 2. Inhibitory pooling was broad in orientation, but narrow in spatial frequency and space. Minkowski pooling used an exponent of 4. All of the data for observer KMF were well fit by the model. We have developed a contrast gain control model that fits masking data. Unlike Foley's, our model accepts images as inputs. Unlike Teo & Heeger's, our model did not require multiple channels for different dynamic ranges.

  1. Universe creation on a computer

    Science.gov (United States)

    McCabe, Gordon

    The purpose of this paper is to provide an account of the epistemology and metaphysics of universe creation on a computer. The paper begins with F.J. Tipler's argument that our experience is indistinguishable from the experience of someone embedded in a perfect computer simulation of our own universe, hence we cannot know whether or not we are part of such a computer program ourselves. Tipler's argument is treated as a special case of epistemological scepticism, in a similar vein to 'brain-in-a-vat' arguments. It is argued that Tipler's hypothesis that our universe is a program running on a digital computer in another universe, generates empirical predictions, and is therefore a falsifiable hypothesis. The computer program hypothesis is also treated as a hypothesis about what exists beyond the physical world, and is compared with Kant's metaphysics of noumena. It is argued that if our universe is a program running on a digital computer, then our universe must have compact spatial topology, and the possibilities of observationally testing this prediction are considered. The possibility of testing the computer program hypothesis with the value of the density parameter Ω0 is also analysed. The informational requirements for a computer to represent a universe exactly and completely are considered. Consequent doubt is thrown upon Tipler's claim that if a hierarchy of computer universes exists, we would not be able to know which 'level of implementation' our universe exists at. It is then argued that a digital computer simulation of a universe, or any other physical system, does not provide a realisation of that universe or system. It is argued that a digital computer simulation of a physical system is not objectively related to that physical system, and therefore cannot exist as anything else other than a physical process occurring upon the components of the computer. It is concluded that Tipler's sceptical hypothesis, and a related hypothesis from Bostrom, cannot be

  2. Nablus mask-like facial syndrome

    DEFF Research Database (Denmark)

    Allanson, Judith; Smith, Amanda; Hare, Heather

    2012-01-01

    Nablus mask-like facial syndrome (NMLFS) has many distinctive phenotypic features, particularly tight glistening skin with reduced facial expression, blepharophimosis, telecanthus, bulky nasal tip, abnormal external ear architecture, upswept frontal hairline, and sparse eyebrows. Over the last few...... heterozygous deletions significantly overlapping the region associated with NMLFS. Notably, while one mother and child were said to have mild tightening of facial skin, none of these individuals exhibited reduced facial expression or the classical facial phenotype of NMLFS. These findings indicate...

  3. Masking a Compact AES S-box

    Science.gov (United States)

    2007-08-07

    Lecture Notes in Computer Science , pages 309–18, 2001. [2] D. Canright. A very compact S-box for AES. In CHES2005, volume 3659 of Lecture Notes in Computer Science , pages...et al., editor, CHES2003, volume 2779 of Lecture Notes in Computer Science , pages 319–333. Springer, 2003. [4] Jovan Dj. Golić and Christophe Tymen...Multiplicative masking and power analysis of AES. In CHES 2002, volume 2523 of Lecture

  4. Mask image position correction for double patterning lithography

    Science.gov (United States)

    Saito, Masato; Itoh, Masamitsu; Ikenaga, Osamu; Ishigo, Kazutaka

    2008-05-01

    Application of double patterning technique has been discussed for lithography of HP 3X nm device generation. In this case, overlay budget for lithography becomes so hard that it is difficult to achieve it with only improvement of photomask's position accuracy. One of the factors of overlay error will be induced by distortion of photomask after chucking on the mask stage of exposure tool, because photomasks are bended by the force of vacuum chucking. Recently, mask flatness prediction technique was developed. This technique is simulating the surface shape of mask when it is on the mask stage by using the flatness data of free-standing state blank and the information of mask chucking stage. To use this predicted flatness data, it is possible to predict a pattern position error after exposed and it is possible to correct it on the photomask. A blank supplier developed the flatness data transfer system to mask vender. Every blanks are distinguished individually by 2D barcode mark on blank which including serial number. The flatness data of each blank is linked with this serial number, and mask vender can use this serial number as a key code to mask flatness data. We developed mask image position correction system by using 2D barcode mark linked to predicted flatness data, and position accuracy assurance system for these masks. And with these systems, we made some masks actually.

  5. 248-nm DUV MoSiON embedded phase-shifting mask for 0.25 micrometer lithography

    Science.gov (United States)

    Dao, Giang T.; Liu, Gang; Hainsey, Robert F.; Farnsworth, Jeff N.; Tokoro, Yasuo; Kawada, Susumu; Yamamoto, Tsuneo; Yoshioka, Nobuyuki; Chiba, Akira; Morimoto, Hiroaki

    1995-07-01

    Over the past five years worldwide efforts have been made to develop new techniques for optical lithography enhancement. These techniques include optical proximity correction, off-axis illumination, pupil filtering and phase-shifting mask (PSM). Among many phase-shifting mask approaches, embedded PSM (EPSM) method has drawn significant interest due to its relatively simple reticle fabrication process and excellent lithographic performance, in particular, for dark field mask layers such as contact and via holes. Perhaps, the most difficult task in materializing the EPSM technology is the creation of a thin film structure that controls both phase and transmission. In addition, this film structure must withstand severe environment of mask making process and yet can be inspected and repaired successfully using currently available tool sets. The newly developed MoSiON material meets these requirements and has demonstrated a feasibility for DUV EPSM pilot production. In this paper, characteristics of the DUV lifetime test results. Details of reticle fabrication process including e-beam writing, dry etching, inspection and repair will be presented along with chemical durability data and process capability. Finally, wafer level lithographic performance for contact holes printed on a step-and-scan and a projection aligner will be shown to demonstrate lithographic performance of 248 nm DUV EPSM for 0.25 micrometer lithography.

  6. Dose masking feature for BNCT radiotherapy planning

    Science.gov (United States)

    Cook, Jeremy L.; Wessol, Daniel E.; Wheeler, Floyd J.

    2000-01-01

    A system for displaying an accurate model of isodoses to be used in radiotherapy so that appropriate planning can be performed prior to actual treatment on a patient. The nature of the simulation of the radiotherapy planning for BNCT and Fast Neutron Therapy, etc., requires that the doses be computed in the entire volume. The "entire volume" includes the patient and beam geometries as well as the air spaces in between. Isodoses derived from the computed doses will therefore extend into the air regions between the patient and beam geometries and thus depict the unrealistic possibility that radiation deposition occurs in regions containing no physical media. This problem is solved by computing the doses for the entire geometry and then masking the physical and air regions along with the isodose contours superimposed over the patient image at the corresponding plane. The user is thus able to mask out (remove) the contour lines from the unwanted areas of the image by selecting the appropriate contour masking region from the raster image.

  7. The New York Public Library Automated Book Catalog Subsystem

    Directory of Open Access Journals (Sweden)

    S. Michael Malinconico

    1973-03-01

    Full Text Available A comprehensive automated bibliographic control system has been developed by the New York Public Library. This system is unique in its use of an automated authority system and highly sophisticated machine filing algorithms. The primary aim was the rigorous control of established forms and their cross-reference structure. The original impetus for creation of the system, and its most highly visible product, is a photocomposed book catalog. The book catalog subsystem supplies automatic punctuation of condensed entries and contains the ability to pmduce cumulation/ supplement book catalogs in installments without loss of control of the crossreferencing structure.

  8. Direct 3D printed shadow mask on Silicon

    Science.gov (United States)

    Rahiminejad, S.; Köhler, E.; Enoksson, P.

    2016-10-01

    A 3D printed shadow mask method is presented. The 3D printer prints ABS plastic directly on the wafer, thus avoiding gaps between the wafer and the shadow mask, and deformation during the process. The wafer together with the 3D printed shadow mask was sputtered with Ti and Au. The shadow mask was released by immersion in acetone. The sputtered patches through the shadow mask were compared to the opening of the 3D printed shadow mask and the design dimensions. The patterned Au patches were larger than the printed apertures, however they were smaller than the design widths. The mask was printed in 4 min, the cost is less than one euro cent, and the process is a low temperature process suitable for temperature sensitive components.

  9. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  10. Taking Stock of Project Value Creation

    DEFF Research Database (Denmark)

    Laursen, Markus; Svejvig, Per

    2014-01-01

    This paper presents the outcome of a literature review through classifying and analyzing 59 publications in project value creation literature. The analysis led to five distinct categories: Benefit Realization Management (BRM) and techniques, broad value perspective, value time frame, engineering...

  11. Fabrics China Creation Show Held in Shanghai

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    On August 5-6th,the 3rd Fabrics China Creation Show (one series events of Reach & Touch),organized by China National Textile & Apparel Council and National Textile Development Center,was held in Shanghai,

  12. Automated DNA Sequencing System

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, G.A.; Ekkebus, C.P.; Hauser, L.J.; Kress, R.L.; Mural, R.J.

    1999-04-25

    Oak Ridge National Laboratory (ORNL) is developing a core DNA sequencing facility to support biological research endeavors at ORNL and to conduct basic sequencing automation research. This facility is novel because its development is based on existing standard biology laboratory equipment; thus, the development process is of interest to the many small laboratories trying to use automation to control costs and increase throughput. Before automation, biology Laboratory personnel purified DNA, completed cycle sequencing, and prepared 96-well sample plates with commercially available hardware designed specifically for each step in the process. Following purification and thermal cycling, an automated sequencing machine was used for the sequencing. A technician handled all movement of the 96-well sample plates between machines. To automate the process, ORNL is adding a CRS Robotics A- 465 arm, ABI 377 sequencing machine, automated centrifuge, automated refrigerator, and possibly an automated SpeedVac. The entire system will be integrated with one central controller that will direct each machine and the robot. The goal of this system is to completely automate the sequencing procedure from bacterial cell samples through ready-to-be-sequenced DNA and ultimately to completed sequence. The system will be flexible and will accommodate different chemistries than existing automated sequencing lines. The system will be expanded in the future to include colony picking and/or actual sequencing. This discrete event, DNA sequencing system will demonstrate that smaller sequencing labs can achieve cost-effective the laboratory grow.

  13. Value creation and the entrepreneurial business

    OpenAIRE

    Spivey, Michael F.; Jeffrey J. McMillan

    2002-01-01

    The need to finance high growth and manage the interests and needs of investors makes value creation a critical concern for entrepreneurial businesses. Almost any financial endeavor, such as attracting new investors or making investment decisions, necessitates the consideration of the equity value created by the endeavor. The perceived value creation, for example, has a direct effect on the percentage of the firm outside investors will require if they are to invest in the business. Measuring ...

  14. Black Hole - Moving Mirror II: Particle Creation

    OpenAIRE

    Good, Michael R. R.; Anderson, Paul R.; Evans, Charles R.

    2015-01-01

    There is an exact correspondence between the simplest solution to Einstein's equations describing the formation of a black hole and a particular moving mirror trajectory. In both cases the Bogolubov coefficients in 1+1 dimensions are identical and can be computed analytically. Particle creation is investigated by using wave packets. The entire particle creation history is computed, incorporating the early-time non-thermal emission due to the formation of the black hole (or the early-time acce...

  15. Service systems for value co-creation

    OpenAIRE

    Smith, Laura A.; Ng, Irene C. L.

    2012-01-01

    Over the last few decades there has been growing interest from both marketing researchers and practitioners in the creation of value (Eggert & Ulaga, 2002). In a series of publications on the Service-Dominant Logic (S-D Logic), Vargo and Lusch (2004: 2008) review the economic foundations that underpin how value creation is understood. In doing so, they put forward a number of propositions, which have had a significant impact on current management theory and practice. The central tenant of val...

  16. The masked priming toolbox: an open-source MATLAB toolbox for masked priming researchers.

    Science.gov (United States)

    Wilson, Andrew D; Tresilian, James; Schlaghecken, Friederike

    2011-03-01

    The Masked Priming Toolbox is an open-source collection of MATLAB functions that utilizes the free third-party PsychToolbox-3 (PTB3: Brainard, Spatial Vision, 10, 433-436, 1997; Kleiner, Brainard & Pelli, Perception, 36, 2007; Pelli, Spatial Vision, 10, 437-442, 1997). It is designed to allow a researcher to run masked (and unmasked) priming experiments using a variety of response devices (including keyboards, graphics tablets and force transducers). Very little knowledge of MATLAB is required; experiments are generated by creating a text file with the required parameters, and raw and analyzed data are output to Excel (as well as MATLAB) files for further analysis. The toolbox implements a variety of stimuli for use as primes and targets, as well as a variety of masks. Timing, size, location, and orientation of stimuli are all parameterizable. The code is open-source and made available on the Web under a Creative Commons License.

  17. Ontology-Based Device Descriptions and Device Repository for Building Automation Devices

    Directory of Open Access Journals (Sweden)

    Dibowski Henrik

    2011-01-01

    Full Text Available Device descriptions play an important role in the design and commissioning of modern building automation systems and help reducing the design time and costs. However, all established device descriptions are specialized for certain purposes and suffer from several weaknesses. This hinders a further design automation, which is strongly needed for the more and more complex building automation systems. To overcome these problems, this paper presents novel Ontology-based Device Descriptions (ODDs along with a layered ontology architecture, a specific ontology view approach with virtual properties, a generic access interface, a triple store-based database backend, and a generic search mask GUI with underlying query generation algorithm. It enables a formal, unified, and extensible specification of building automation devices, ensures their comparability, and facilitates a computer-enabled retrieval, selection, and interoperability evaluation, which is essential for an automated design. The scalability of the approach to several ten thousand devices is demonstrated.

  18. Noninvasive CPAP with face mask: comparison among new air-entrainment masks and the Boussignac valve.

    Science.gov (United States)

    Mistraletti, Giovanni; Giacomini, Matteo; Sabbatini, Giovanni; Pinciroli, Riccardo; Mantovani, Elena S; Umbrello, Michele; Palmisano, Debora; Formenti, Paolo; Destrebecq, Anne L L; Iapichino, Gaetano

    2013-02-01

    The performances of 2 noninvasive CPAP systems (high flow and low flow air-entrainment masks) were compared to the Boussignac valve in 3 different scenarios. Scenario 1: pneumatic lung simulator with a tachypnea pattern (tidal volume 800 mL at 40 breaths/min). Scenario 2: Ten healthy subjects studied during tidal breaths and tachypnea. Scenario 3: Twenty ICU subjects enrolled for a noninvasive CPAP session. Differences between set and effective CPAP level and F(IO(2)), as well as the lowest airway pressure and the pressure swing around the imposed CPAP level, were analyzed. The lowest airway pressure and swing were correlated to the pressure-time product (area of the airway pressure curve below the CPAP level) measured with the simulator. P(aO(2)) was a subject's further performance index. Lung simulator: Boussignac F(IO(2)) was 0.54, even if supplied with pure oxygen. The air-entrainment masks had higher swing than the Boussignac (P = .007). Pressure-time product correlated better with pressure swing (Spearman correlation coefficient [ρ] = 0.97) than with lowest airway pressure (ρ = 0.92). In healthy subjects, the high-flow air-entrainment mask showed lower difference between set and effective F(IO(2)) (P high-flow mask had lower swing than the Boussignac valve (P = .03) with similar P(aO(2)) increase. High-flow air-entrainment mask showed the best performance in human subjects. During high flow demand, the Boussignac valve delivered lower than expected F(IO(2)) and showed higher dynamic hyper-pressurization than the air-entrainment masks. © 2013 Daedalus Enterprises.

  19. Strategy optimization for mask rule check in wafer fab

    Science.gov (United States)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  20. Gender difference in mask ventilation training of anesthesia residents.

    Science.gov (United States)

    Koga, Tomomichi; Kawamoto, Masashi

    2009-05-01

    To investigate whether gender difference has an effect on an anesthesia resident's ability to perform successful mask ventilation. Cohort study. Surgical operation theater of a university-affiliated hospital. 839 ASA physical status I, II, and III patients undergoing general anesthesia performed by residents. Mask ventilation was performed by 21 different anesthesia residents. Difficult mask ventilation was defined as the inability of an unassisted resident to maintain oxygen saturation, significant gas flow leakage beneath the face mask, need to increase gas flow, no perceptible chest movement, assistance required using a two-handed mask ventilation technique, or use of the oxygen flush valve more than twice. Instances of difficult mask ventilation were observed in 210 patients (25.0%), though all were adequately ventilated with a face mask. Difficult mask ventilation was observed significantly more often with female (29.8%) than male (20.0%) residents. Residents' gender was shown to be an independent risk factor for difficult mask ventilation. Gender difference has an effect on the mask ventilation learning process, as it was more difficult for female residents to provide a tight air seal in the early stage of training.

  1. Mask data volume: historical perspective and future requirements

    Science.gov (United States)

    Spence, Chris; Goad, Scott; Buck, Peter; Gladhill, Richard; Cinque, Russell; Preuninger, Jürgen; Griesinger, Üwe; Blöcker, Martin

    2006-06-01

    Mask data file sizes are increasing as we move from technology generation to generation. The historical 30% linear shrink every 2-3 years that has been called Moore's Law, has driven a doubling of the transistor budget and hence feature count. The transition from steppers to step-and-scan tools has increased the area of the mask that needs to be patterned. At the 130nm node and below, Optical Proximity Correction (OPC) has become prevalent, and the edge fragmentation required to implement OPC leads to an increase in the number of polygons required to define the layout. Furthermore, Resolution Enhancement Techniques (RETs) such as Sub-Resolution Assist Features (SRAFs) or tri-tone Phase Shift Masks (PSM) require additional features to be defined on the mask which do not resolve on the wafer, further increasing masks volumes. In this paper we review historical data on mask file sizes for microprocessor, DRAM and Flash memory designs. We consider the consequences of this increase in file size on Mask Data Prep (MDP) activities, both within the Integrated Device Manufacturer (IDM) and Mask Shop, namely: computer resources, storage and networks (for file transfer). The impact of larger file sizes on mask writing times is also reviewed. Finally we consider, based on the trends that have been observed over the last 5 technology nodes, what will be required to maintain reasonable MDP and mask manufacturing cycle times.

  2. Source mask optimization using 3D mask and compact resist models

    Science.gov (United States)

    El-Sewefy, Omar; Chen, Ao; Lafferty, Neal; Meiring, Jason; Chung, Angeline; Foong, Yee Mei; Adam, Kostas; Sturtevant, John

    2016-03-01

    Source Mask Optimization (SMO) has played an important role in technology setup and ground rule definition since the 2x nm technology node. While improvements in SMO algorithms have produced higher quality and more consistent results, the accuracy of the overall solution is critically linked to how faithfully the entire patterning system is modeled, from mask down to substrate. Fortunately, modeling technology has continued to advance to provide greater accuracy in modeling 3D mask effects, 3D resist behavior, and resist phenomena. Specifically, the Domain Decomposition Method (DDM) approximates the 3D mask response as a superposition of edge-responses.1 The DDM can be applied to a sectorized illumination source based on Hybrid-Hopkins Abbe approximation,2 which provides an accurate and fast solution for the modeling of 3D mask effects and has been widely used in OPC modeling. The implementation of DDM in the SMO flow, however, is more challenging because the shape and intensity of the source, unlike the case in OPC modeling, is evolving along the optimization path. As a result, it gets more complicated. It is accepted that inadequate pupil sectorization results in reduced accuracy in any application, however in SMO the required uniformity and density of pupil sampling is higher than typical OPC and modeling cases. In this paper, we describe a novel method to implement DDM in the SMO flow. The source sectorization is defined by following the universal pixel sizes used in SMO. Fast algorithms are developed to enable computation of edge signals from each fine pixel of the source. In this case, each pixel has accurate information to describe its contribution to imaging and the overall objective function. A more continuous angular spectrum from 3D mask scattering is thus captured, leading to accurate modeling of 3D mask effects throughout source optimization. This method is applied on a 2x nm middle-of-line layer test case. The impact of the 3D mask model accuracy on

  3. Women and trauma: transformation of self through mask making and action-based mask work

    OpenAIRE

    Birch, June Elizabeth

    2011-01-01

    This secondary analysis study examined the stories of six women who were impacted by trauma. These women attended a ten-week counselling group in which they participated in the construction of masks and in action-based mask work as a means of expressing and working through their trauma experiences. Based on a constructivist approach, the methodology employed in this study was a narrative inquiry centred on the work of Lieblich, Tuval-Mashiach, and Zilber (1998). The data were generated from o...

  4. Laboratory Automation and Middleware.

    Science.gov (United States)

    Riben, Michael

    2015-06-01

    The practice of surgical pathology is under constant pressure to deliver the highest quality of service, reduce errors, increase throughput, and decrease turnaround time while at the same time dealing with an aging workforce, increasing financial constraints, and economic uncertainty. Although not able to implement total laboratory automation, great progress continues to be made in workstation automation in all areas of the pathology laboratory. This report highlights the benefits and challenges of pathology automation, reviews middleware and its use to facilitate automation, and reviews the progress so far in the anatomic pathology laboratory.

  5. Toward an Integrated Framework for Automated Development and Optimization of Online Advertising Campaigns

    OpenAIRE

    Thomaidou, Stamatina; Vazirgiannis, Michalis; Liakopoulos, Kyriakos

    2012-01-01

    Creating and monitoring competitive and cost-effective pay-per-click advertisement campaigns through the web-search channel is a resource demanding task in terms of expertise and effort. Assisting or even automating the work of an advertising specialist will have an unrivaled commercial value. In this paper we propose a methodology, an architecture, and a fully functional framework for semi- and fully- automated creation, monitoring, and optimization of cost-efficient pay-per-click campaigns ...

  6. Practical use of the repeating patterns in mask writing

    Science.gov (United States)

    Shoji, Masahiro; Inoue, Tadao; Yamabe, Masaki

    2010-03-01

    In May 2006, the Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched a 4-year program for reducing mask manufacturing cost and TAT by concurrent optimization of MDP, mask writing, and mask inspection. As one of the tasks being pursued at the Mask Design Data Technology Research Laboratory, we have evaluated the effect of reducing the drawing shot counts by utilizing the repeating patterns, and showed positive impact on mask making by using CP drawing. During the past four years, we have developed a software to extract repeating patterns from fractured OPCed mask data which can be used to minimize the shot counts. In this evaluation, we have used an actual device production data obtained from the member companies of MaskD2I. To the extraction software we added new functions for extracting common repeating patterns from a set of multiple masks, and studied how this step can reduce the counts in comparison to the shot counts required during the conventional mask writing techniques. We have also developed software that uses the extraction result of repeating patterns and prepares drawing-data for the MCC/CP drawing system, which has been developed at the Mask Writing Equipment Technology Research Laboratory. With this software, we have simulated EB proximity effect on CP writing and examined how it affect the shot count reduction where CP shots with large CD errors are to be divided into VSB shots. In this paper, we will report the evaluation result of the practical application of repeating patterns in mask writing with this software.

  7. Generic hierarchical engine for mask data preparation

    Science.gov (United States)

    Kalus, Christian K.; Roessl, Wolfgang; Schnitker, Uwe; Simecek, Michal

    2002-07-01

    Electronic layouts are usually flattened on their path from the hierarchical source downstream to the wafer. Mask data preparation has certainly been identified as a severe bottleneck since long. Data volumes are not only doubling every year along the ITRS roadmap. With the advent of optical proximity correction and phase-shifting masks data volumes are escalating up to non-manageable heights. Hierarchical treatment is one of the most powerful means to keep memory and CPU consumption in reasonable ranges. Only recently, however, has this technique acquired more public attention. Mask data preparation is the most critical area calling for a sound infrastructure to reduce the handling problem. Gaining more and more attention though, are other applications such as large area simulation and manufacturing rule checking (MRC). They all would profit from a generic engine capable to efficiently treat hierarchical data. In this paper we will present a generic engine for hierarchical treatment which solves the major problem, steady transitions along cell borders. Several alternatives exist how to walk through the hierarchy tree. They have, to date, not been thoroughly investigated. One is a bottom-up attempt to treat cells starting with the most elementary cells. The other one is a top-down approach which lends itself to creating a new hierarchy tree. In addition, since the variety, degree of hierarchy and quality of layouts extends over a wide range a generic engine has to take intelligent decisions when exploding the hierarchy tree. Several applications will be shown, in particular how far the limits can be pushed with the current hierarchical engine.

  8. Early diagnosis of masked hypertension in adolescents

    Directory of Open Access Journals (Sweden)

    Ledyaev M.Ya.

    2016-12-01

    Full Text Available Objective: to improve diagnosis of latent arterial hypertension by studying the characteristics of hemodynamics and the rigidity of the vascular walls of the arteries in adolescents with this phenomenon. Material and Methods. The study involved 147 children aged 11 to 18 years who did not have heart rhythm disorders, congenital heart defects, endocrine diseases and diseases of the kidneys. They were divided into three groups on the basis of blood pressure values (BP obtained during three measurements of blood pressure according to the method of N. S. Korotkov and when conducting 24-hours ambulatory blood pressure monitoring (ABPM. Group 1 included children with blood pressure values in the range from 5 to 95 percentile. Group 2 was composed children with masked hypertension (values of office blood pressure in the range from 5 to 95 percentile but indicators of ABPM of blood pressure is greater than 95 percentile. Group 3 included children with stable arterial hypertension (blood pressure values exceeded the 95 percentile. The study was a comparative analysis of the hemodynamic and rigidity (stiffness of the arteries. Results: Most hemodynamic parameters in children with masked hypertension were higher than in children of group 1. However, these figures were lower than in children with stable arterial hypertension. Among the indicators of the rigidity of the arteries, the most sensitive indicator (dP/dt max was maximum rate of pressure rise. Children with masked hypertension had increased arterial stiffness, however it was lower than in children with stable arterial hypertension. Conclusion: The use of BPLab monitor with technology Vasotens allows physicians to evaluate the daily profile of arterial pressure, the hemodynamics and stiffness of blood vessels, which is an important step for early diagnostics of latent arterial hypertension in children

  9. Masking properties of ceramics for veneer restorations.

    Science.gov (United States)

    Skyllouriotis, Andreas L; Yamamoto, Hideo L; Nathanson, Dan

    2017-10-01

    The translucency and opacity of ceramics play a significant role in emulating the natural color of teeth, but studies of the masking properties and limitations of dental ceramics when used as monolayer restorations are lacking. The purpose of this in vitro study was to determine the translucency of 6 materials used for veneer restorations by assessing their translucency parameters (TPs), contrast ratios (CRs), and potential to mask dark tooth colors. Ten square- or disk-shaped specimens (0.5-mm thickness, shade A2) were fabricated from Vitablocks Mark II (VMII; Vita Zahnfabrik), IPS e.max CAD LT (EMXC LT; Ivoclar Vivadent AG), IPS e.max CAD HT (EMXC HT; Ivoclar Vivadent AG), IPS Empress CAD LT (EMP LT; Ivoclar Vivadent AG), IPS e.max Press LT (EMXP LT; Ivoclar Vivadent AG), and CZR (CZR; Kuraray Noritake Dental Inc). Their luminance (Y) values over black and over white tiles were measured, followed by their color (CIELab) over black tiles and white tiles and shaded A2 (control group), A3.5, A4, and B4 acrylic resin blocks. All measurements were performed using a spectrophotometer in 2 different areas on each specimen. Then CRs, TPs, and color differences (over shaded backgrounds) were determined. Data were subjected to 1-way and 2-way ANOVA (α=.05) for analysis. Mean CR values of EMXP LT were significantly higher than those of the other tested materials, whereas VMII and EMXC HT had the lowest values (Pceramic materials, whereas shade B4 demonstrated the lowest mean background effect (Pceramics were revealed (Pceramics exhibited poor masking properties against the A4 background. The color differences of most tested ceramics were more acceptable when tested against the B4 background (ΔE*≤3.3). Copyright © 2016 Editorial Council for the Journal of Prosthetic Dentistry. Published by Elsevier Inc. All rights reserved.

  10. Crowding is unlike ordinary masking: distinguishing feature integration from detection.

    Science.gov (United States)

    Pelli, Denis G; Palomares, Melanie; Majaj, Najib J

    2004-12-30

    A letter in the peripheral visual field is much harder to identify in the presence of nearby letters. This is "crowding." Both crowding and ordinary masking are special cases of "masking," which, in general, refers to any effect of a "mask" pattern on the discriminability of a signal. Here we characterize crowding, and propose a diagnostic test to distinguish it from ordinary masking. In ordinary masking, the signal disappears. In crowding, it remains visible, but is ambiguous, jumbled with its neighbors. Masks are usually effective only if they overlap the signal, but the crowding effect extends over a large region. The width of that region is proportional to signal eccentricity from the fovea and independent of signal size, mask size, mask contrast, signal and mask font, and number of masks. At 4 deg eccentricity, the threshold contrast for identification of a 0.32 deg signal letter is elevated (up to six-fold) by mask letters anywhere in a 2.3 deg region, 7 times wider than the signal. In ordinary masking, threshold contrast rises as a power function of mask contrast, with a shallow log-log slope of 0.5 to 1, whereas, in crowding, threshold is a sigmoidal function of mask contrast, with a steep log-log slope of 2 at close spacing. Most remarkably, although the threshold elevation decreases exponentially with spacing, the threshold and saturation contrasts of crowding are independent of spacing. Finally, ordinary masking is similar for detection and identification, but crowding occurs only for identification, not detection. More precisely, crowding occurs only in tasks that cannot be done based on a single detection by coarsely coded feature detectors. These results (and observers' introspections) suggest that ordinary masking blocks feature detection, so the signal disappears, while crowding (like "illusory conjunction") is excessive feature integration - detected features are integrated over an inappropriately large area because there are no smaller integration

  11. Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

    Science.gov (United States)

    Pack, Robert C.; Standiford, Keith; Lukanc, Todd; Ning, Guo Xiang; Verma, Piyush; Batarseh, Fadi; Chua, Gek Soon; Fujimura, Akira; Pang, Linyong

    2014-10-01

    A methodology is described wherein a calibrated model-based `Virtual' Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask designs prior to Mask Data Preparation (MDP) and mask fabrication. This type of verification addresses physical effects which occur in mask writing that may impact lithographic printing fidelity and variability. The work described here is motivated by requirements for extreme accuracy and control of variations for today's most demanding IC products. These extreme demands necessitate careful and detailed analysis of all potential sources of uncompensated error or variation and extreme control of these at each stage of the integrated OPC/ MDP/ Mask/ silicon lithography flow. The important potential sources of variation we focus on here originate on the basis of VSB mask writer physics and other errors inherent in the mask writing process. The deposited electron beam dose distribution may be examined in a manner similar to optical lithography aerial image analysis and image edge log-slope analysis. This approach enables one to catch, grade, and mitigate problems early and thus reduce the likelihood for costly long-loop iterations between OPC, MDP, and wafer fabrication flows. It moreover describes how to detect regions of a layout or mask where hotspots may occur or where the robustness to intrinsic variations may be improved by modification to the OPC, choice of mask technology, or by judicious design of VSB shots and dose assignment.

  12. Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

    Science.gov (United States)

    Emoto, Keiji; Sakai, Fumio; Sato, Chiaki; Takabayashi, Yukio; Nakano, Hitoshi; Takabayashi, Tsuneo; Yamamoto, Kiyohito; Hattori, Tadashi; Hiura, Mitsuru; Ando, Toshiaki; Kawanobe, Yoshio; Azuma, Hisanobu; Iwanaga, Takehiko; Choi, Jin; Aghili, Ali; Jones, Chris; Irving, J. W.; Fletcher, Brian; Ye, Zhengmao

    2016-03-01

    Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. Criteria specific to any lithographic process for the semiconductor industry include overlay, throughput and defectivity. The purpose of this paper is to describe the technology advancements made in the reduction of particle adders in an imprint tool and introduce the new mask replication tool that will enable the fabrication of replica masks with added residual image placement errors suitable for memory devices with half pitches smaller than 15nm. Hard particles on a wafer or mask create the possibility of creating a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, test stand results demonstrate the potential for extending mask life to better than 1000 wafers. Additionally, a new replication tool, the FPA-1100 NR2 is introduced. Mask chuck flatness simulation results were also performed and demonstrate that residual image placement errors can be reduced to as little as 1nm.

  13. EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

    Science.gov (United States)

    Takekoshi, Hidekazu; Nakayama, Takahito; Saito, Kenichi; Ando, Hiroyoshi; Inoue, Hideo; Nakayamada, Noriaki; Kamikubo, Takashi; Nishimura, Rieko; Kojima, Yoshinori; Yashima, Jun; Anpo, Akihito; Nakazawa, Seiichi; Iijima, Tomohiro; Ohtoshi, Kenji; Anze, Hirohito; Katsap, Victor; Golladay, Steven; Kendall, Rodney

    2014-10-01

    In the half pitch (hp) 16nm generation, the shot count on a mask is expected to become bipolar. The multi-patterning technology in lithography seems to maintain the shot count around 300G shots instead of increase in the number of masks needed for one layer. However, as a result of mask multiplication, the better positional accuracy would be required especially in Mask-to-Mask overlay. On the other hand, in complex OPC, the shot count on a mask is expected to exceed 1T shots. In addition, regardless of the shot count forecast, the resist sensitivity needs to be lower to reduce the shot noise effect so as to get better LER. In other words, slow resist would appear on main stream, in near future. Hence, such trend would result in longer write time than that of the previous generations. At the same time, most mask makers request masks to be written within 24 hours. Thus, a faster mask writer with better writing accuracy than those of previous generations is needed. With this background, a new electron beam mask writing system, EBM- 9000, has been developed to satisfy such requirements of the hp 16nm generation. The development of EBM-9000 has focused on improving throughput for larger shot counts and improving the writing accuracy.

  14. Revolution with and without the mask

    Directory of Open Access Journals (Sweden)

    Milanko Vladan

    2010-01-01

    Full Text Available This paper is an attempt to provide a certain “second reading” of those commonplaces which imply that a particular, personal interest always lies behind the mask of objectivity, necessity and truth. As a paradigmatic example of this kind of structure that implies “hidden truths”, here will be taken that of a revolution, whether it is a fascist, a liberal-democratic or a communist revolution. By reexamining how this motif of “truth-behind-the-mask” figures in those regimes, we will try to say something about each of them, and also about the specific kind of subject that is produced under them.

  15. Computer-assisted area detector masking.

    Science.gov (United States)

    Wright, Christopher J; Zhou, Xiao Dong

    2017-03-01

    Area detectors have become the predominant type of detector for the rapid acquisition of X-ray diffraction, small-angle scattering and total scattering. These detectors record the scattering for a large area, giving each shot good statistical significance to the resulting scattered intensity I(Q) pattern. However, many of these detectors have pixel level defects, which cause error in the resulting one-dimensional patterns. In this work, new software to automatically find and mask these dead pixels and other defects is presented. This algorithm is benchmarked with both ideal simulated and experimental datasets.

  16. Silicon germanium mask for deep silicon etching

    KAUST Repository

    Serry, Mohamed

    2014-07-29

    Polycrystalline silicon germanium (SiGe) can offer excellent etch selectivity to silicon during cryogenic deep reactive ion etching in an SF.sub.6/O.sub.2 plasma. Etch selectivity of over 800:1 (Si:SiGe) may be achieved at etch temperatures from -80 degrees Celsius to -140 degrees Celsius. High aspect ratio structures with high resolution may be patterned into Si substrates using SiGe as a hard mask layer for construction of microelectromechanical systems (MEMS) devices and semiconductor devices.

  17. Logistics potentials in business competitive advantage creation

    Directory of Open Access Journals (Sweden)

    Rafał Matwiejczuk

    2013-12-01

    Full Text Available Background: Companies constantly search for ways to achieve and sustain long-term competitive advantage. Among the factors influencing the competitive advantage creation there are so called logistics potentials, which constitute a component part of a business strategic potentials. Logistics resources, logistics capabilities and logistics competences are the main components of the logistics potentials structure and hierarchy. Methods: In order to recognize the logistics potentials which determine the competitive advantage creation one may use the assumptions and elements of contemporary management concepts, including strategic management. In particular the article deals with Resource-Based View (RBV, Dynamic Capabilities Concept (DCC and - first of all - Competence-Based Management (CBM. Results and conclusions: Several significant research projects have presented a wide scope and a large number of possibilities of logistics potentials (and logistics competences in particular influence on business competitive advantage creation. The article briefly presents the research results conducted by: (1 Michigan State University (USA, (2 European Logistics Association (ELA in cooperation with A.T. Kearney, (3 Computer Sciences Corporation and (4 Capgemini. The research results have pointed out to differentiated but at the same distinctive symptoms of logistics competences influence on competitive advantage creation. The article also refers to the results of the research carried out by the Chair of Logistics & Marketing at Opole University (Poland in companies operating in Poland. The research has been mainly dealing with the significance of logistics competences in competitive advantage creation.

  18. On the relations between crowding and visual masking.

    Science.gov (United States)

    Huckauf, Anke; Heller, Dieter

    2004-05-01

    To study the question of which processes contribute to crowding and whether these are comparable to those of visual temporal masking, we varied the stimulus onset asynchrony (SOA) between target and flankers in a crowding setting. Monotonically increasing Type A masking functions observedfor small spacings and large eccentricities indicate that the integration of information from target and flankers underlies crowding. Decreasing masking functions obtained for large spacings and small eccentricities relate processes of crowding to those contributing to Type B masking. In addition, Type B masking was more frequent with letter-like nonletter flankers than with letter flankers, suggesting that Type B masking, just like crowding over large areas, is due to higher level interactions. The rapid decrease of the effects of interletter spacing and eccentricity with increasing SOA indicates that positional information is transient.

  19. Constellation-masked secure communication technique for OFDM-PON.

    Science.gov (United States)

    Liu, Bo; Zhang, Lijia; Xin, Xiangjun; Yu, Jianjun

    2012-10-22

    This paper proposes a novel secure communication technique using constellation masking for applications in orthogonal frequency division multiplexing passive optical network (OFDM-PON). The constellation masking is applied both on each subcarrier and among different subcarriers. The Arnold mapping is utilized as the parameter function for the mask factors. A interleave length is employed to provide a scalable masking granularity for different ONUs. A 15.54 Gb/s constellation-masked 32QAM-OFDM signal has been successfully transmitted over 25-km single mode fiber in the experiment. Experimental results show that the proposed scheme can effectively protect the system from illegal ONU without wasting the bandwidth. The constellation-masked technique suggests an effective solution for the physical secure communication in future OFDM access network.

  20. Characterizing the monaural and binaural processes underlying reflection masking

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2007-01-01

    Reflection masked thresholds (RMTs) for the simple scenario of a test reflection masked by the direct sound (200 ms long broadband noise) were measured as a function of reflection delay for diotic and dichotic stimulus presentations. In order to discriminate between contributions to reflection...... masking from simultaneous versus forward masking, the simultaneous RMT was measured in addition to the traditional RMT. Simultaneous RM was realized by truncating the offset of the test reflection such that the test reflection and the direct sound had a common offset. By comparing the experimental results...... for the two RMTs, it is shown that forward masking effects only have a significant effect on reflection masking for delays above 7–10 ms. Moreover, binaural mechanisms were revealed which deteriorate auditory detection of test reflections for delays below 7–10 ms and enhance detection for larger delays...

  1. Mask manufacturing improvement through capability definition and bottleneck line management

    Science.gov (United States)

    Strott, Al

    1994-02-01

    In 1989, Intel's internal mask operation limited itself to research and development activities and re-inspection and pellicle application of externally manufactured masks. Recognizing the rising capital cost of mask manufacturing at the leading edge, Intel's Mask Operation management decided to offset some of these costs by manufacturing more masks internally. This was the beginning of the challenge they set to manufacture at least 50% of Intel's mask volume internally, at world class performance levels. The first step in responding to this challenge was the completion of a comprehensive operation capability analysis. A series of bottleneck improvements by focus teams resulted in an average cycle time improvement to less than five days on all product and less than two days on critical products.

  2. Exoplanet Coronagraph Shaped Pupil Masks and Laboratory Scale Star Shade Masks: Design, Fabrication and Characterization

    Science.gov (United States)

    Balasubramanian, Kunjithapatha; White, Victor; Yee, Karl; Echternach, Pierre; Muller, Richard; Dickie, Matthew; Cady, Eric; Mejia Prada, Camilo; Ryan, Daniel; Poberezhskiy, Ilya; hide

    2015-01-01

    Star light suppression technologies to find and characterize faint exoplanets include internal coronagraph instruments as well as external star shade occulters. Currently, the NASA WFIRST-AFTA mission study includes an internal coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host star light to about 10 -9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultra-low reflectivity regions, uniformity, wave front quality, achromaticity, etc. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed (HCIT) at JPL and from the High Contrast Imaging Lab (HCIL) at Princeton University. We also present briefly the technologies applied to fabricate laboratory scale star shade masks.

  3. In-die job automation for PROVE

    Science.gov (United States)

    Lesnick, Ronald J., Jr.; Kim, Stephen; Waechter, Matthias; Seidel, Dirk; Mueller, Andreas; Beyer, Dirk

    2011-05-01

    The increasing demands for registration metrology for repeatability, accuracy, and resolution in order to be able to perform measurements in the active area on production features have prompted the development of PROVETM, the nextgeneration registration metrology tool that utilizes 193nm illumination and a metrology stage that is actively controlled in all six degrees of freedom. PROVETM addresses full in-die capability for double patterning lithography and sophisticated inverse-lithography schemes. Innovative approaches for image analysis, such as 2D correlation, have been developed to achieve this demanding goal. In order to take full advantage of the PROVETM resolution and measurement capabilities, a direct link to the mask data preparation for job automation and marker identification is inevitable. This paper describes an integrated solution using Synopsys' CATSR for extracting and preparing tool-specific job input data for PROVE. In addition to the standard marking functionalities, CATSR supports the 2D correlation method by providing reference clips in OASIS.MASK format.

  4. Automating checks of plan check automation.

    Science.gov (United States)

    Halabi, Tarek; Lu, Hsiao-Ming

    2014-07-08

    While a few physicists have designed new plan check automation solutions for their clinics, fewer, if any, managed to adapt existing solutions. As complex and varied as the systems they check, these programs must gain the full confidence of those who would run them on countless patient plans. The present automation effort, planCheck, therefore focuses on versatility and ease of implementation and verification. To demonstrate this, we apply planCheck to proton gantry, stereotactic proton gantry, stereotactic proton fixed beam (STAR), and IMRT treatments.

  5. Volume Phase Masks in Photo-Thermo-Refractive Glass

    Science.gov (United States)

    2014-10-06

    2014 Approved for public release; distribution is unlimited. Volume phase masks in photo- thermo -refractive glass The views, opinions and/or findings...in photo- thermo -refractive glass Report Title In many applications such as beam shaping, mode conversion, and phase encoding it is necessary to alter...requiring a new means of producing phase masks. In this dissertation a method for producing robust phase masks in the bulk of photo- thermo - refractive

  6. Electron optical mask projector with a photocathode for miniaturization

    Science.gov (United States)

    Moellenstedt, G.; Speidel, R.; Dostmann, M.; Martin, F.; Mayr, M.

    1981-06-01

    The projector was developed with an image converter consisting of a masked photocathode and a plane anode grid. The mask structure to be demagnified is on a quartz glass plate in a thin layer of Ti02 strongly absorbing ultraviolet light. A photoemissive layer is deposited by evaporation on the whole front side of the plate. For the demagnification of the electron image of the mask, a system is used consisting of two geometrically similar magnetic lenses in a telescopic arrangement.

  7. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    OpenAIRE

    Yuri L. Motoyama; Gustavo B. Joel; Paulo E. A. Pereira; Gilmar J. Esteves; Azevedo, Paulo H.S.M.

    2016-01-01

    Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK) or a control group (CONT) and completed five sets of chest presses and parallel squats until failure at 75%...

  8. OSIRIS Multi-Object Spectroscopy: Mask Design Process

    Science.gov (United States)

    Gómez-Velarde, G.; García-Alvarez, D.; Cabrerra-Lavers, A.

    2016-10-01

    The OSIRIS (Optical System for Imaging and Low-Intermediate Resolution Integrated Spectroscopy) instrument at the 10.4 m GTC has offered a multi-object spectroscopic mode since March 2014. In this paper we describe the detailed process of designing a MOS mask for OSIRIS by using the Mask Designer Tool, and give some numbers on the accuracy of the mask manufacture achievable at the telescope for its scientific use.

  9. Automate functional testing

    Directory of Open Access Journals (Sweden)

    Ramesh Kalindri

    2014-06-01

    Full Text Available Currently, software engineers are increasingly turning to the option of automating functional tests, but not always have successful in this endeavor. Reasons range from low planning until over cost in the process. Some principles that can guide teams in automating these tests are described in this article.

  10. Automation in Warehouse Development

    NARCIS (Netherlands)

    Hamberg, R.; Verriet, J.

    2012-01-01

    The warehouses of the future will come in a variety of forms, but with a few common ingredients. Firstly, human operational handling of items in warehouses is increasingly being replaced by automated item handling. Extended warehouse automation counteracts the scarcity of human operators and support

  11. More Benefits of Automation.

    Science.gov (United States)

    Getz, Malcolm

    1988-01-01

    Describes a study that measured the benefits of an automated catalog and automated circulation system from the library user's point of view in terms of the value of time saved. Topics discussed include patterns of use, access time, availability of information, search behaviors, and the effectiveness of the measures used. (seven references)…

  12. Inflationary models driven by adiabatic matter creation

    CERN Document Server

    Abramo, L R W

    1996-01-01

    The flat inflationary dust universe with matter creation proposed by Prigogine and coworkers is generalized and its dynamical properties are reexamined. It is shown that the starting point of these models depends critically on a dimensionless parameter \\Sigma, closely related to the matter creation rate \\psi. For \\Sigma bigger or smaller than unity flat universes can emerge, respectively, either like a Big-Bang FRW singularity or as a Minkowski space-time at t=-\\infty. The case \\Sigma=1 corresponds to a de Sitter-type solution, a fixed point in the phase diagram of the system, supported by the matter creation process. The curvature effects have also been investigated. The inflating de Sitter is a universal attractor for all expanding solutions regardless of the initial conditions as well as of the curvature parameter.

  13. Entrepreneurship, Job Creation and Wage Growth

    DEFF Research Database (Denmark)

    Malchow-Møller, Nikolaj; Schjerning, Bertel; Sørensen, Anders

    2011-01-01

    This paper analyses the importance of entrepreneurs in terms of job creation and wage growth. Relying on unique data that cover all establishments, firms and individuals in the Danish private sector, we are able to distil a number of different subsets from the total set of new establishments......—subsets which allow us to more precisely capture the “truly new” or “entrepreneurial” establishments than has been possible in previous studies. Using these data, we find that while new establishments in general account for one-third of the gross job creation in the economy, entrepreneurial establishments...... are responsible for around 25% of this, and thus only account for about 8% of total gross job creation in the economy. However, entrepreneurial establishments seem to generate more additional jobs than other new establishments in the years following entry. Finally, the jobs generated by entrepreneurial...

  14. Entrepreneurship, Job Creation, and Wage Growth

    DEFF Research Database (Denmark)

    Malchow-Møller, Nikolaj; Schjerning, Bertel; Sørensen, Anders

    This paper analyses the importance of entrepreneurs for job creation and wage growth. Relying on unique data that cover all establishments, firms and individuals in the Danish private sector, we are able to distil a number of different subsets from the total set of new establishments - subsets...... which allow us to more precisely capture the "truly new" or "entrepreneurial" establishments than in previous studies. Using these data, we find that while new establishments in general account for one third of the gross job creation in the economy, entrepreneurial establishments are responsible...... for around 25% of this, and thus only account for about 8% of total gross job creation in the economy. However, entrepreneurial establishments seem to generate more additional jobs than other new establishments in the years following entry. Finally, the jobs generated by entrepreneurial establishments...

  15. Aquinas and Contemporary Cosmology: Creation and Beginnings

    Science.gov (United States)

    Carroll, William E.

    Discussions in the Middle Ages about creation and the temporal beginning of the world involved sophisticated analyses in theology, metaphysics, and natural philosophy. Mediaeval insights on this subject, especially Thomas Aquinas' defense of the intelligibility of an eternal, created universe, can help to clarify reflections about the philosophical and theological implications of contemporary cosmological theories: from the "singularity" of the Big Bang, to "quantum tunneling from nothing," to multiverse scenarios. Thomas' insights help us to see the value of Georges Lemaître's insistence that his cosmological reflections must be kept separate from an analysis of creation. This essay will look at different senses of "beginning" and examine the claim that creation, in its fundamental meaning, tells us nothing about whether there is a temporal beginning to the universe. Multiverse models, like that recently proposed by Stephen Hawking and Leonard Mlodinow, may challenge certain views of a Grand Designer, but not of a Creator.

  16. Entrepreneurship, job creation and wage growth

    DEFF Research Database (Denmark)

    Malchow-Møller, Nikolaj; Schjerning, Bertel; Sørensen, Anders

    2011-01-01

      This paper analyses the importance of entrepreneurs for job creation and wage growth. Relying on unique data that cover all establishments, firms and individuals in the Danish private sector, we are able to distil a number of different subsets from the total set of new establishments - subsets...... which allow us to more precisely capture the "truly new" or "entrepreneurial" establishments than in previous studies. Using these data, we find that while new establishments in general account for one third of the gross job creation in the economy, entrepreneurial establishments are responsible...... for around 25% of this, and thus only account for about 8% of total gross job creation in the economy. However, entrepreneurial establishments seem to generate more additional jobs than other new establishments in the years following entry. Finally, the jobs generated by entrepreneurial establishments...

  17. View Creation for Queriesin Object Oriented Databases

    Institute of Scientific and Technical Information of China (English)

    Rajesh Narang; K.D. Sharma

    1999-01-01

    A view in object oriented databasescorresponds to virtual schema with restructured generalization anddecomposition hierarchies. Numbers of view creation methodologies havebeen proposed. A major drawback of existing methodologies is that theydo not maintain the closure property. That is, the result of a querydoes not have the same semantics as embodied in the object oriented datamodel. Therefore, this paper presents a view creation methodology thatderives a class in response to a user's query, integrates derived classin global schema (i.e., considers the problem of classes moving in classhierarchy) and selects the required classes from global schema to createthe view for user's query. Novel idea of view creation includes: (a) anobject algebra for class derivation and customization (where the derivedclasses in terms of object instances and procedure/methods are studied),(b) maintenance of closure property, and (c) classification algorithmwhich provides mechanism to deal with the problem of a class moving in aclass hierarchy.

  18. Distinctive Dynamic Capabilities for New Business Creation

    DEFF Research Database (Denmark)

    Rosenø, Axel; Enkel, Ellen; Mezger, Florian

    2013-01-01

    This study examines the distinctive dynamic capabilities for new business creation in established companies. We argue that these are very different from those for managing incremental innovation within a company's core business. We also propose that such capabilities are needed in both slow...... and fast-paced industries, and that similarities exist across industries. Hence, the study contributes to dynamic capabilities literature by: 1) identifying the distinctive dynamic capabilities for new business creation; 2) shifting focus away from dynamic capabilities in environments characterised by high...... clock-speed and uncertainty towards considering dynamic capabilities for the purpose of developing new businesses, which also implies a high degree of uncertainty. Based on interviews with 33 companies, we identify distinctive dynamic capabilities for new business creation, find that dynamic...

  19. Dynamic wormholes with particle creation mechanism

    Energy Technology Data Exchange (ETDEWEB)

    Pan, Supriya; Chakraborty, Subenoy [Jadavpur University, Department of Mathematics, Kolkata (India)

    2015-01-01

    The present work deals with a spherically symmetric space-time which is asymptotically (at spatial infinity) FRW space-time and represents wormhole configuration: The matter component is divided into two parts - (a) dissipative but homogeneous and isotropic fluid, and (b) an inhomogeneous and anisotropic barotropic fluid. Evolving wormhole solutions are obtained when isotropic fluid is phantom in nature and there is a big rip singularity at the end. Here the dissipative phenomena is due to the particle creation mechanism in non-equilibrium thermodynamics. Using the process to be adiabatic, the dissipative pressure is expressed linearly to the particle creation rate. For two choices of the particle creation rate as a function of the Hubble parameter, the equation of state parameter of the isotropic fluid is constrained to be in the phantom domain, except in one choice, it is possible to have wormhole configuration with normal isotropic fluid. (orig.)

  20. Organizational Values and Innovative Organizational Knowledge Creation

    Directory of Open Access Journals (Sweden)

    Lilian Aparecida Pasquini Miguel

    2009-01-01

    Full Text Available Innovation is a source of competitive advantage and is based on the continuous creation of organizational knowledge, which is supported by the individual learning. The individual learning of traditional / comportamentalist and constructivist nature can be understood, by extension, as organizational learning. The knowledge can be innovative if, along with the enabling conditions that characterize it - intention, fluctuation or chaos, autonomy, redundancy and variety of requirements – the process of learning is based on a constructivist nature, the only one capable to generate new learning solutions. The organizational values are beliefs that guide the organizations behavior and constitute motivational goals. This work had as aim to identify the relationship between organizational values and the creation of knowledge. The descriptive exploratory research used the quantitative method. The organizational values appeared in this study mainly associated to the knowledge creation aspects in the internal sphere of the organizations. The orientation towards the external environment appeared less related to the organizational values.

  1. Automated model building

    CERN Document Server

    Caferra, Ricardo; Peltier, Nicholas

    2004-01-01

    This is the first book on automated model building, a discipline of automated deduction that is of growing importance Although models and their construction are important per se, automated model building has appeared as a natural enrichment of automated deduction, especially in the attempt to capture the human way of reasoning The book provides an historical overview of the field of automated deduction, and presents the foundations of different existing approaches to model construction, in particular those developed by the authors Finite and infinite model building techniques are presented The main emphasis is on calculi-based methods, and relevant practical results are provided The book is of interest to researchers and graduate students in computer science, computational logic and artificial intelligence It can also be used as a textbook in advanced undergraduate courses

  2. Automation in Warehouse Development

    CERN Document Server

    Verriet, Jacques

    2012-01-01

    The warehouses of the future will come in a variety of forms, but with a few common ingredients. Firstly, human operational handling of items in warehouses is increasingly being replaced by automated item handling. Extended warehouse automation counteracts the scarcity of human operators and supports the quality of picking processes. Secondly, the development of models to simulate and analyse warehouse designs and their components facilitates the challenging task of developing warehouses that take into account each customer’s individual requirements and logistic processes. Automation in Warehouse Development addresses both types of automation from the innovative perspective of applied science. In particular, it describes the outcomes of the Falcon project, a joint endeavour by a consortium of industrial and academic partners. The results include a model-based approach to automate warehouse control design, analysis models for warehouse design, concepts for robotic item handling and computer vision, and auton...

  3. Automation in Immunohematology

    Directory of Open Access Journals (Sweden)

    Meenu Bajpai

    2012-01-01

    Full Text Available There have been rapid technological advances in blood banking in South Asian region over the past decade with an increasing emphasis on quality and safety of blood products. The conventional test tube technique has given way to newer techniques such as column agglutination technique, solid phase red cell adherence assay, and erythrocyte-magnetized technique. These new technologies are adaptable to automation and major manufacturers in this field have come up with semi and fully automated equipments for immunohematology tests in the blood bank. Automation improves the objectivity and reproducibility of tests. It reduces human errors in patient identification and transcription errors. Documentation and traceability of tests, reagents and processes and archiving of results is another major advantage of automation. Shifting from manual methods to automation is a major undertaking for any transfusion service to provide quality patient care with lesser turnaround time for their ever increasing workload. This article discusses the various issues involved in the process.

  4. Advances in inspection automation

    Science.gov (United States)

    Weber, Walter H.; Mair, H. Douglas; Jansen, Dion; Lombardi, Luciano

    2013-01-01

    This new session at QNDE reflects the growing interest in inspection automation. Our paper describes a newly developed platform that makes the complex NDE automation possible without the need for software programmers. Inspection tasks that are tedious, error-prone or impossible for humans to perform can now be automated using a form of drag and drop visual scripting. Our work attempts to rectify the problem that NDE is not keeping pace with the rest of factory automation. Outside of NDE, robots routinely and autonomously machine parts, assemble components, weld structures and report progress to corporate databases. By contrast, components arriving in the NDT department typically require manual part handling, calibrations and analysis. The automation examples in this paper cover the development of robotic thickness gauging and the use of adaptive contour following on the NRU reactor inspection at Chalk River.

  5. Automation in immunohematology.

    Science.gov (United States)

    Bajpai, Meenu; Kaur, Ravneet; Gupta, Ekta

    2012-07-01

    There have been rapid technological advances in blood banking in South Asian region over the past decade with an increasing emphasis on quality and safety of blood products. The conventional test tube technique has given way to newer techniques such as column agglutination technique, solid phase red cell adherence assay, and erythrocyte-magnetized technique. These new technologies are adaptable to automation and major manufacturers in this field have come up with semi and fully automated equipments for immunohematology tests in the blood bank. Automation improves the objectivity and reproducibility of tests. It reduces human errors in patient identification and transcription errors. Documentation and traceability of tests, reagents and processes and archiving of results is another major advantage of automation. Shifting from manual methods to automation is a major undertaking for any transfusion service to provide quality patient care with lesser turnaround time for their ever increasing workload. This article discusses the various issues involved in the process.

  6. Quality enhancement of parallel MDP flows with mask suppliers

    Science.gov (United States)

    Deng, Erwin; Lee, Rachel; Lee, Chun Der

    2013-06-01

    For many maskshops, designed parallel mask data preparation (MDP) flows accompanying with a final data comparison are viewed as a reliable method that could reduce quality risks caused by mis-operation. However, in recent years, more and more mask data mistakes have shown that present parallel MDP flows could not capture all mask data errors yet. In this paper, we will show major failure models of parallel MDP flows from analyzing MDP quality accidents and share our approaches to achieve further improvement with mask suppliers together.

  7. Thermal management of masks for deep x-ray lithography.

    Energy Technology Data Exchange (ETDEWEB)

    Khounsary, A.; Chojnowski, D.; Mancini, D.C.; Lai, B.; Dejus, R.

    1997-11-18

    This paper addresses some options and techniques in the thermal management of masks used in deep x-ray lithography. The x-ray masks are thin plates made of low-atomic-number materials on which a patterned thin film of a high-atomic-number metal has been deposited. When they are exposed to an x-ray beam, part of the radiation is transmitted to replicate the pattern on a downstream photoresist, and the remainder is absorbed in the mask in the form of heat. This heat load can cause deformation of the mask and thus image distortion in the lithography process. The mask geometry considered in the present study is 100 mm x 100 mm in area, and about 0.1 to 2 mm thick. The incident radiation is a bending magnet x-ray beam having a footprint of 60 mm x 4 mm at the mask. The mask is scanned vertically about {+-} 30 mm so that a 60 mm x 60 mm area is exposed. the maximum absorbed heat load in the mask is 80 W, which is significantly greater than a few watts encountered in previous systems. In this paper, cooling techniques, substrate material selection, transient and steady state thermal and structural behavior, and other thermo-mechanical aspects of mask design are discussed. It is shown that, while diamond and graphite remain attractive candidates, at present beryllium is a more suitable material for this purpose and, when properly cooled, can provide the necessary dimensional tolerance.

  8. Practical mask inspection system with printability and pattern priority verification

    Science.gov (United States)

    Tsuchiya, Hideo; Ozaki, Fumio; Takahara, Kenichi; Inoue, Takafumi; Kikuiri, Nobutaka

    2011-05-01

    Through the four years of study in Association of Super-Advanced Electronics Technologies (ASET) on reducing mask manufacturing Turn Around Time (TAT) and cost, we have been able to establish a technology to improve the efficiency of the review process by applying a printability verification function that utilizes computational lithography simulations to analyze defects detected by a high-resolution mask inspection system. With the advent of Source-Mask Optimization (SMO) and other technologies that extend the life of existing optical lithography, it is becoming extremely difficult to judge a defect only by the shape of a mask pattern, while avoiding pseudo-defects. Thus, printability verification is indispensable for filtering out nuisance defects from high-resolution mask inspection results. When using computational lithography simulations to verify printability with high precision, the image captured by the inspection system must be prepared with extensive care. However, for practical applications, this preparation process needs to be simplified. In addition, utilizing Mask Data Rank (MDR) to vary the defect detection sensitivity according to the patterns is also useful for simultaneously inspecting minute patterns and avoiding pseudo-defects. Combining these two technologies, we believe practical mask inspection for next generation lithography is achievable. We have been improving the estimation accuracy of the printability verification function through discussion with several customers and evaluation of their masks. In this report, we will describe the progress of these practical mask verification functions developed through customers' evaluations.

  9. Estimation of the Ideal Binary Mask using Directional Systems

    DEFF Research Database (Denmark)

    Boldt, Jesper; Kjems, Ulrik; Pedersen, Michael Syskind

    2008-01-01

    and the requirements to enable calculations of the ideal binary mask using a directional system without the availability of the unmixed signals. The proposed method has a low complexity and is verified using computer simulation in both ideal and non-ideal setups showing promising results.......The ideal binary mask is often seen as a goal for time-frequency masking algorithms trying to increase speech intelligibility, but the required availability of the unmixed signals makes it difficult to calculate the ideal binary mask in any real-life applications. In this paper we derive the theory...

  10. Recent advances in CZT strip detectors and coded mask imagers

    Science.gov (United States)

    Matteson, J. L.; Gruber, D. E.; Heindl, W. A.; Pelling, M. R.; Peterson, L. E.; Rothschild, R. E.; Skelton, R. T.; Hink, P. L.; Slavis, K. R.; Binns, W. R.; Tumer, T.; Visser, G.

    1999-09-01

    The UCSD, WU, UCR and Nova collaboration has made significant progress on the necessary techniques for coded mask imaging of gamma-ray bursts: position sensitive CZT detectors with good energy resolution, ASIC readout, coded mask imaging, and background properties at balloon altitudes. Results on coded mask imaging techniques appropriate for wide field imaging and localization of gamma-ray bursts are presented, including a shadowgram and deconvolved image taken with a prototype detector/ASIC and MURA mask. This research was supported by NASA Grants NAG5-5111, NAG5-5114, and NGT5-50170.

  11. Recent patents and patented technology platforms for pharmaceutical taste masking.

    Science.gov (United States)

    Kaushik, Deepak; Dureja, Harish

    2014-04-01

    Taste masking is an important factor in the development of oral dosage forms containing bitter active pharmaceutical ingredients. Currently numerous techniques are being applied to overcome this problem. Realizing this, several researchers and pharmaceutical companies are now engaged in developing novel techniques to address the problem of taste masking evident by numerous patents filed in this area in recent times. In this review the most recent patents for taste masking are discussed and how these patents overcome the limitations of conventional approaches of taste masking is also highlighted. Novel techniques based on some recent patents such as nanohybrid, melt extrusion, non-complex cyclodextrin compositions and off taste masking are providing new realms to taste masking of bitter drugs. The present article also provides an overview of various patented platform technologies based on different techniques/mechanisms employed for taste masking. The unique features and principles of taste-masking approaches used in various patented technologies are also discussed. A better understanding of these new patents and patented technologies will help researchers and pharmaceutical industries to select the appropriate platform, or to develop innovative products with improved taste masking properties.

  12. Automating Ontological Annotation with WordNet

    Energy Technology Data Exchange (ETDEWEB)

    Sanfilippo, Antonio P.; Tratz, Stephen C.; Gregory, Michelle L.; Chappell, Alan R.; Whitney, Paul D.; Posse, Christian; Paulson, Patrick R.; Baddeley, Bob L.; Hohimer, Ryan E.; White, Amanda M.

    2006-01-22

    Semantic Web applications require robust and accurate annotation tools that are capable of automating the assignment of ontological classes to words in naturally occurring text (ontological annotation). Most current ontologies do not include rich lexical databases and are therefore not easily integrated with word sense disambiguation algorithms that are needed to automate ontological annotation. WordNet provides a potentially ideal solution to this problem as it offers a highly structured lexical conceptual representation that has been extensively used to develop word sense disambiguation algorithms. However, WordNet has not been designed as an ontology, and while it can be easily turned into one, the result of doing this would present users with serious practical limitations due to the great number of concepts (synonym sets) it contains. Moreover, mapping WordNet to an existing ontology may be difficult and requires substantial labor. We propose to overcome these limitations by developing an analytical platform that (1) provides a WordNet-based ontology offering a manageable and yet comprehensive set of concept classes, (2) leverages the lexical richness of WordNet to give an extensive characterization of concept class in terms of lexical instances, and (3) integrates a class recognition algorithm that automates the assignment of concept classes to words in naturally occurring text. The ensuing framework makes available an ontological annotation platform that can be effectively integrated with intelligence analysis systems to facilitate evidence marshaling and sustain the creation and validation of inference models.

  13. The perturbation paradigm modulates error-based learning in a highly automated task: outcomes in swallowing kinematics.

    Science.gov (United States)

    Anderson, C; Macrae, P; Taylor-Kamara, I; Serel, S; Vose, A; Humbert, I A

    2015-08-15

    Traditional motor learning studies focus on highly goal-oriented, volitional tasks that often do not readily generalize to real-world movements. The goal of this study was to investigate how different perturbation paradigms alter error-based learning outcomes in a highly automated task. Swallowing was perturbed with neck surface electrical stimulation that opposes hyo-laryngeal elevation in 25 healthy adults (30 swallows: 10 preperturbation, 10 perturbation, and 10 postperturbation). The four study conditions were gradual-masked, gradual-unmasked, abrupt-masked, and abrupt-unmasked. Gradual perturbations increasingly intensified overtime, while abrupt perturbations were sustained at the same high intensity. The masked conditions reduced cues about the presence/absence of the perturbation (pre- and postperturbation periods had low stimulation), but unmasked conditions did not (pre- and postperturbation periods had no stimulation). Only hyo-laryngeal range of motion measures had significant outcomes; no timing measure demonstrated learning. Systematic-error reduction occurred only during the abrupt-masked and abrupt-unmasked perturbations. Only the abrupt-masked perturbation caused aftereffects. In this highly automated task, gradual perturbations did not induce learning similarly to findings of some volitional, goal-oriented adaptation task studies. Furthermore, our subtle and brief adjustment of the stimulation paradigm (masked vs. unmasked) determined whether aftereffects were present. This suggests that, in the unmasked group, sensory predictions of a motor plan were quickly and efficiently modified to disengage error-based learning behaviors. Copyright © 2015 the American Physiological Society.

  14. Black Hole - Moving Mirror II: Particle Creation

    CERN Document Server

    Good, Michael R R; Evans, Charles R

    2015-01-01

    There is an exact correspondence between the simplest solution to Einstein's equations describing the formation of a black hole and a particular moving mirror trajectory. In both cases the Bogolubov coefficients in 1+1 dimensions are identical and can be computed analytically. Particle creation is investigated by using wave packets. The entire particle creation history is computed, incorporating the early-time non-thermal emission due to the formation of the black hole (or the early-time acceleration of the moving mirror) and the evolution to a Planckian spectrum.

  15. The demonism of creation in Goethe's philosophy

    Directory of Open Access Journals (Sweden)

    Nicolae Râmbu

    2012-12-01

    Full Text Available Goethe's philosophy of creativity revolves around what he called das Dämonische. This essay is not meant as a definition or an explanation of demonic creation, but instead presents a demonic work par excellence, as the term "demonic" is defined by Goethe in the Elegy from Marienbad. The process of the creation of this work, as it is described by Goethe, also represents a strange exorcism, as the entire daemonic creative force of the author is transposed in this lyrical masterpiece of German and universal literature. After writing the Elegy Goethe, it is no longer demonic.

  16. Designing Learning for Co-Creation

    DEFF Research Database (Denmark)

    Gnaur, Dorina; Larsen-Nielsen, Inger Marie

    2017-01-01

    educational frameworks that respond to the societal demand for co-creation, particularly within the public welfare sector? First, they focus on which organisational and individual requirements an HE learning design should take into account in order to support the diffusion of co-creation competences....... Then they argue for the need to integrate these considerations in the learning design and demonstrate a practical application in the form of a didactical design. They call this a hybrid learning design, in that it takes advantage of technological developments to mediate co-creative learning in multiple learning...

  17. Particle creation by peak electric field

    CERN Document Server

    Adorno, T C; Gitman, D M

    2016-01-01

    The particle creation by the so-called peak electric field is considered. The latter field is a combination of two exponential parts, one exponentially-increasing and another exponentially-decreasing. We find exact solutions of the Dirac equation with the field under consideration with appropriate asymptotic conditions and calculate all the characteristics of particle creation effect, in particular, differential mean numbers of created particle, total number of created particles, and the probability for a vacuum to remain a vacuum. Characteristic asymptotic regimes are discussed in detail and a comparison with the pure asymptotically decaying field is considered.

  18. Particle creation by peak electric field

    Energy Technology Data Exchange (ETDEWEB)

    Adorno, T.C. [Tomsk State University, Department of Physics, Tomsk (Russian Federation); Gavrilov, S.P. [Tomsk State University, Department of Physics, Tomsk (Russian Federation); Herzen State Pedagogical University of Russia, Department of General and Experimental Physics, St. Petersburg (Russian Federation); Gitman, D.M. [Tomsk State University, Department of Physics, Tomsk (Russian Federation); P. N. Lebedev Physical Institute, Moscow (Russian Federation); University of Sao Paulo, Institute of Physics, CP 66318, Sao Paulo, SP (Brazil)

    2016-08-15

    The particle creation by the so-called peak electric field is considered. The latter field is a combination of two exponential parts, one exponentially increasing and another exponentially decreasing. We find exact solutions of the Dirac equation with the field under consideration with appropriate asymptotic conditions and calculate all the characteristics of particle creation effect, in particular, differential mean numbers of created particle, total number of created particles, and the probability for a vacuum to remain a vacuum. Characteristic asymptotic regimes are discussed in detail and a comparison with the pure asymptotically decaying field is considered. (orig.)

  19. Designing High Performance Factory Automation Applications on Top of DDS

    Directory of Open Access Journals (Sweden)

    Isidro Calvo

    2013-04-01

    Full Text Available DDS is a recent specification aimed at providing high‐performance publisher/subscriber middleware solutions. Despite being a very powerful flexible technology, it may prove complex to use, especially for the inexperienced. This work provides some guidelines for connecting software components that represent a new generation of automation devices (such as PLCs, IPCs and robots using Data Distribution Service (DDS as a virtual software bus. More specifically, it presents the design of a DDS‐based component, the so‐called Automation Component, and discusses how to map different traffic patterns using DDS entities exploiting the wealth of QoS management mechanisms provided by the DDS specification. A case study demonstrates the creation of factory automation applications out of software components that encapsulate independent stations.

  20. Automation Tools for Finite Element Analysis of Adhesively Bonded Joints

    Science.gov (United States)

    Tahmasebi, Farhad; Brodeur, Stephen J. (Technical Monitor)

    2002-01-01

    This article presents two new automation creation tools that obtain stresses and strains (Shear and peel) in adhesively bonded joints. For a given adhesively bonded joint Finite Element model, in which the adhesive is characterised using springs, these automation tools read the corresponding input and output files, use the spring forces and deformations to obtain the adhesive stresses and strains, sort the stresses and strains in descending order, and generate plot files for 3D visualisation of the stress and strain fields. Grids (nodes) and elements can be numbered in any order that is convenient for the user. Using the automation tools, trade-off studies, which are needed for design of adhesively bonded joints, can be performed very quickly.

  1. Designing High Performance Factory Automation Applications on Top of DDS

    Directory of Open Access Journals (Sweden)

    Isidro Calvo

    2013-04-01

    Full Text Available DDS is a recent specification aimed at providing high-performance publisher/subscriber middleware solutions. Despite being a very powerful flexible technology, it may prove complex to use, especially for the inexperienced. This work provides some guidelines for connecting software components that represent a new generation of automation devices (such as PLCs, IPCs and robots using Data Distribution Service (DDS as a virtual software bus. More specifically, it presents the design of a DDS-based component, the so-called Automation Component, and discusses how to map different traffic patterns using DDS entities exploiting the wealth of QoS management mechanisms provided by the DDS specification. A case study demonstrates the creation of factory automation applications out of software components that encapsulate independent stations.

  2. Customer Avionics Interface Development and Analysis (CAIDA) Lab DEWESoft Display Creation

    Science.gov (United States)

    Coffey, Connor

    2015-01-01

    The Customer Avionics Interface Development and Analysis (CAIDA) Lab supports the testing of the Launch Control System (LCS), NASA's command and control system for the Space Launch System (SLS), Orion Multi-Purpose Crew Vehicle (MPCV), and ground support equipment. The objectives of the year-long internship were to support day-to-day operations of the CAIDA Lab, create prelaunch and tracking displays for Orion's Exploration Flight Test 1 (EFT-1), and create a program to automate the creation of displays for SLS and MPCV to be used by CAIDA and the Record and Playback Subsystem (RPS).

  3. Actinic inspection of multilayer defects on EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Barty, A; Liu, Y; Gullikson, E; Taylor, J S; Wood, O

    2005-03-24

    The production of defect-free mask blanks, and the development of techniques for inspecting and qualifying EUV mask blanks, remains a key challenge for EUV lithography. In order to ensure a reliable supply of defect-free mask blanks, it is necessary to develop techniques to reliably and accurately detect defects on un-patterned mask blanks. These inspection tools must be able to accurately detect all critical defects whilst simultaneously having the minimum possible false-positive detection rate. There continues to be improvement in high-speed non-actinic mask blank inspection tools, and it is anticipated that these tools can and will be used by industry to qualify EUV mask blanks. However, the outstanding question remains one of validating that non-actinic inspection techniques are capable of detecting all printable EUV defects. To qualify the performance of non-actinic inspection tools, a unique dual-mode EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron at Lawrence Berkeley National Laboratory. In high-speed inspection mode, whole mask blanks are scanned for defects using 13.5-nm wavelength light to identify and map all locations on the mask that scatter a significant amount of EUV light. In imaging, or defect review mode, a zone plate is placed in the reflected beam path to image a region of interest onto a CCD detector with an effective resolution on the mask of 100-nm or better. Combining the capabilities of the two inspection tools into one system provides the unique capability to determine the coordinates of native defects that can be used to compare actinic defect inspection with visible light defect inspection tools under commercial development, and to provide data for comparing scattering models for EUV mask defects.

  4. Systematic review automation technologies

    Science.gov (United States)

    2014-01-01

    Systematic reviews, a cornerstone of evidence-based medicine, are not produced quickly enough to support clinical practice. The cost of production, availability of the requisite expertise and timeliness are often quoted as major contributors for the delay. This detailed survey of the state of the art of information systems designed to support or automate individual tasks in the systematic review, and in particular systematic reviews of randomized controlled clinical trials, reveals trends that see the convergence of several parallel research projects. We surveyed literature describing informatics systems that support or automate the processes of systematic review or each of the tasks of the systematic review. Several projects focus on automating, simplifying and/or streamlining specific tasks of the systematic review. Some tasks are already fully automated while others are still largely manual. In this review, we describe each task and the effect that its automation would have on the entire systematic review process, summarize the existing information system support for each task, and highlight where further research is needed for realizing automation for the task. Integration of the systems that automate systematic review tasks may lead to a revised systematic review workflow. We envisage the optimized workflow will lead to system in which each systematic review is described as a computer program that automatically retrieves relevant trials, appraises them, extracts and synthesizes data, evaluates the risk of bias, performs meta-analysis calculations, and produces a report in real time. PMID:25005128

  5. Behind the Evolution-Creation Science Controversy.

    Science.gov (United States)

    Parker, Franklin

    1982-01-01

    Historical background to Arkansas Act 590, mandating inclusion of creationism in public school curriculum, is given, including the history of antievolution bills, emergence of textbook watchers, and political issues in the law's passage. Suggestions are given for elementary and secondary teachers to become informed and active regarding…

  6. Public Funds and Local Biotechnology Firm Creation

    NARCIS (Netherlands)

    Kolympiris, C.; Kalaitzandonakes, N.; Miller, D.

    2014-01-01

    A long stream of academic literature has established that public funding towards research and development matters for economic growth because it relates to increases in innovation, productivity and the like. The impact of public funding on the creation of new firms has received less attention in thi

  7. Creation of Magnetic Monopoles in Classical Scattering

    CERN Document Server

    Vachaspati, Tanmay

    2016-01-01

    We consider the creation of 't Hooft-Polyakov magnetic monopoles by scattering classical wave packets of gauge fields. An example with eight clearly separated magnetic poles created with parity violating helical initial conditions is shown. No clear separation of topological charge is observed with corresponding parity symmetric initial conditions.

  8. Fabrics China Creation Show Hold in Shanghai

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    @@ On August 5-6th.the 3rd Fabrics China Creation Show(one series events of Reach & Touch),organized by China National Textile & Apparel Council and National Textile Development Center,was held in Shanghai,aiming to providing textile producers and designers a platform to show their inspirations and creative ideas in fabric design.

  9. The balancing act of optimised value creation

    NARCIS (Netherlands)

    Sheombar, Anand; Smit, Jakobus; Silvius, Gilbert

    2009-01-01

    In BOP ventures the notion of “selling to the poor” has steadily been replaced by business approaches that suggest sustainable value creation. This has certain implications, in particular the development of strategies that serve triple bottom-line goals. These include economic, social and environmen

  10. ICT APPROPRIATION: A KNOWLEDGE CREATION PERSPECTIVE

    DEFF Research Database (Denmark)

    Akther, Farzana

    . The theoretical basis of my research is Activity Theory, as developed by the Finnish psychologist Engeström on the basis of the Russian development psychologists Vygotsky’s and Leontjev’s research. This learning approach I have combined with Nonaka and Takeuchi's theory of the dynamics of knowledge creation...

  11. Re-creation of Chinese Traditional Clothing

    Institute of Scientific and Technical Information of China (English)

    刘瑜; 张祖芳

    2003-01-01

    On the basis of analysis on both the typical characteristics of Chinese traditional clothing and trendy fashion on present market that is inspired from it,this paper illustrates several re-creation methods of Chinese traditional clothing.These suggestions would push this oriental traditional clothing to a new high in world fashion field and adopted by more and more common people.

  12. Using Informal Education through Music Video Creation

    Science.gov (United States)

    Cayari, Christopher

    2014-01-01

    Music video creation provides students a new way to express themselves and become better performers and consumers of media. This article provides a new perspective on Lucy Green's informal music pedagogy by enabling students to create music videos in music classrooms; thus, students are able to create music videos that informally develop…

  13. Reconstructing Professional Learning Community as Collective Creation

    Science.gov (United States)

    Allen, David

    2013-01-01

    The article presents a cross-domain inquiry into schoolwide professional learning community. It examines tensions in how professional learning community is conceptualized and how it is enacted in the processes of teacher groups. Drawing on a study of contemporary theatre arts practices, it proposes a model of collective creation that highlights…

  14. Modeling value creation with enterprise architecture

    NARCIS (Netherlands)

    Singh, Prince Mayurank; Jonkers, H.; Iacob, Maria Eugenia; van Sinderen, Marten J.

    2014-01-01

    Firms may not succeed in business if strategies are not properly implemented in practice. Every firm needs to know, represent and master its value creation logic, not only to stay in business but also to keep growing. This paper is about focusing on an important topic in the field of strategic

  15. The Money-Creation Model: Another Pedagogy.

    Science.gov (United States)

    Gamble, Ralph C., Jr.

    1991-01-01

    Describes graphical techniques to help explain the multiple creation of deposits that accompany lending in a fractional reserve banking system. Presents a model that emphasizes the banking system, the interaction of total permitted, required, and excess reserves and deposits. Argues that the approach simplifies information to examining a slope…

  16. Creatio in musica - Creation in Music

    DEFF Research Database (Denmark)

    Schwab, Heinrich Wilhelm

    2007-01-01

    Book abstract  The meaning of the noun 'creation', and the verb 'to create', range from the traditional theological idea of God creating ex nihilo to a more recent sense of the process of artistic conception. This collection of thirteen essays, written by scholars of music, literature, the visual...

  17. Creatio in musica - Creation in Music

    DEFF Research Database (Denmark)

    Schwab, Heinrich Wilhelm

    2007-01-01

    Book abstract  The meaning of the noun 'creation', and the verb 'to create', range from the traditional theological idea of God creating ex nihilo to a more recent sense of the process of artistic conception. This collection of thirteen essays, written by scholars of music, literature, the visual...

  18. Particle creation from the quantum stress tensor

    CERN Document Server

    Firouzjaee, Javad T

    2015-01-01

    Among the different methods to derive particle creation, finding the quantum stress tensor expectation value gives a covariant quantity which can be used for examining the back-reaction issue. However this tensor also includes vacuum polarization in a way that depends on the vacuum chosen. Here we review different aspects of particle creation by looking at energy conservation and at the quantum stress tensor. It will be shown that in the case of general spherically symmetric black holes that have a \\emph{dynamical horizon}, as occurs in a cosmological context, one cannot have pair creation on the horizon because this violates energy conservation. This confirms the results obtained in other ways in a previous paper [25]. Looking at the expectation value of the quantum stress tensor with three different definitions of the vacuum state, we study the nature of particle creation and vacuum polarization in black hole and cosmological models, and the associated stress energy tensors. We show that the thermal tempera...

  19. Dinosaurs on the Ark: The Creation Museum

    Science.gov (United States)

    Asma, Stephen T.

    2007-01-01

    In this article, the author describes the Creation Museum, founded by Ken A. Ham and designed as a rebuttal to the evolutionary view taken by other natural history museums. He discusses the socially conservative roots of the museum's exhibits, and presents Ham's answers to questions about the museum. The message of the museum is that the Bible is…

  20. Tending the tensions in co-creation

    DEFF Research Database (Denmark)

    Phillips, Louise Jane

    -creation as a process of mutual learning to be valued at least as much as the outcome AND the neoliberal instrumentalisation of creativity in the service of social innovation and economic growth. The papers build on the themes of Knowledge and Power in Collaborative Research: A Reflexive Approach (Phillips, Kristiansen...

  1. The Money-Creation Model: Another Pedagogy.

    Science.gov (United States)

    Gamble, Ralph C., Jr.

    1991-01-01

    Describes graphical techniques to help explain the multiple creation of deposits that accompany lending in a fractional reserve banking system. Presents a model that emphasizes the banking system, the interaction of total permitted, required, and excess reserves and deposits. Argues that the approach simplifies information to examining a slope…

  2. Distinctive Dynamic Capabilities for New Business Creation

    DEFF Research Database (Denmark)

    Rosenø, Axel; Enkel, Ellen; Mezger, Florian

    2013-01-01

    This study examines the distinctive dynamic capabilities for new business creation in established companies. We argue that these are very different from those for managing incremental innovation within a company's core business. We also propose that such capabilities are needed in both slow...

  3. Tending the tensions in co-creation

    DEFF Research Database (Denmark)

    Phillips, Professor MSO Louise; Nordentoft, Helle Merete; Pedersen, Lektor Christina Hee;

    2013-01-01

    -creation as a process of mutual learning to be valued at least as much as the outcome AND the neoliberal instrumentalisation of creativity in the service of social innovation and economic growth. The papers build on the themes of Knowledge and Power in Collaborative Research: A Reflexive Approach (Phillips, Kristiansen...

  4. "Scientific Creationism"--A New Inquisition Brewing?

    Science.gov (United States)

    Cloud, Preston

    1977-01-01

    In light of the recent revival of the creationism versus evolution issue, the author briefly summarizes both positions, defends evolution on the basis of fossils and rock ages, and refutes six creationist arguments against evolution. For journal availability, see SO 505 260. (AV)

  5. Battle Brewing Over Arkansas Creationism Law.

    Science.gov (United States)

    Baum, Rudy

    1981-01-01

    Reports recent proceedings regarding a new law enacted in early 1981 in Arkansas which requires schools that teach evolution to teach what the law calls "creation-science." Opposition to the law by the American Civil Liberties Union is discussed. (CS)

  6. Facilitating value co-creation in networks

    DEFF Research Database (Denmark)

    Rasmussen, Mette Apollo

    The dissertation investigates through two ethnographic case studies how value co-creation takes place in inter-organizational networks that have been facilitated by a municipality. The contribution of the study to business network research is the emphasis on development phases of networks and the...

  7. Chef infrastructure automation cookbook

    CERN Document Server

    Marschall, Matthias

    2013-01-01

    Chef Infrastructure Automation Cookbook contains practical recipes on everything you will need to automate your infrastructure using Chef. The book is packed with illustrated code examples to automate your server and cloud infrastructure.The book first shows you the simplest way to achieve a certain task. Then it explains every step in detail, so that you can build your knowledge about how things work. Eventually, the book shows you additional things to consider for each approach. That way, you can learn step-by-step and build profound knowledge on how to go about your configuration management

  8. Automated PCB Inspection System

    Directory of Open Access Journals (Sweden)

    Syed Usama BUKHARI

    2017-05-01

    Full Text Available Development of an automated PCB inspection system as per the need of industry is a challenging task. In this paper a case study is presented, to exhibit, a proposed system for an immigration process of a manual PCB inspection system to an automated PCB inspection system, with a minimal intervention on the existing production flow, for a leading automotive manufacturing company. A detailed design of the system, based on computer vision followed by testing and analysis was proposed, in order to aid the manufacturer in the process of automation.

  9. Automation synthesis modules review.

    Science.gov (United States)

    Boschi, S; Lodi, F; Malizia, C; Cicoria, G; Marengo, M

    2013-06-01

    The introduction of (68)Ga labelled tracers has changed the diagnostic approach to neuroendocrine tumours and the availability of a reliable, long-lived (68)Ge/(68)Ga generator has been at the bases of the development of (68)Ga radiopharmacy. The huge increase in clinical demand, the impact of regulatory issues and a careful radioprotection of the operators have boosted for extensive automation of the production process. The development of automated systems for (68)Ga radiochemistry, different engineering and software strategies and post-processing of the eluate were discussed along with impact of automation with regulations. Copyright © 2012 Elsevier Ltd. All rights reserved.

  10. Multivariate refinement equation with nonnegative masks

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    This paper is concerned with multivariate refinement equations of the type ψ = ∑α∈Zs a(α)ψ(Mx - α),where ψ is the unknown function defined on the s-dimensional Euclidean space Rs, a is a finitely supported nonnegative sequence on Zs, and M is an s × s dilation matrix with m := |detM|. We characterize the existence of L2-solution of refinement equation in terms of spectral radius of a certain finite matrix or transition operator associated with refinement mask a and dilation matrix M. For s = 1 and M = 2, the sufficient and necessary conditions are obtained to characterize the existence of continuous solution of this refinement equation.

  11. Predicting masking release of lateralized speech

    DEFF Research Database (Denmark)

    Chabot-Leclerc, Alexandre; MacDonald, Ewen; Dau, Torsten

    2016-01-01

    al., 2013, J. Acoust. Soc. Am. 130], which uses a short-term equalization-cancellation process to model binaural unmasking. In the conditions where informational masking (IM) was involved, the predicted SRTs were lower than the measured values because the model is blind to confusions experienced......Locsei et al. (2015) [Speech in Noise Workshop, Copenhagen, 46] measured ˝ speech reception thresholds (SRTs) in anechoic conditions where the target speech and the maskers were lateralized using interaural time delays. The maskers were speech-shaped noise (SSN) and reversed babble with 2, 4, or 8...... talkers. For a given interferer type, the number of maskers presented on the target’s side was varied, such that none, some, or all maskers were presented on the same side as the target. In general, SRTs did not vary significantly when at least one masker was presented on the same side as the target...

  12. Coherent diffractive imaging using randomly coded masks

    Energy Technology Data Exchange (ETDEWEB)

    Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); D' Aspremont, Alexandre [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Turner, Joshua J. [Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

    2015-12-07

    We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments.

  13. Bunch Profiling Using a Rotating Mask

    Energy Technology Data Exchange (ETDEWEB)

    Miller, Mitchell; /SLAC /IIT, Chicago

    2012-08-24

    The current method for measuring profiles of proton bunches in accelerators is severely lacking. One must dedicate a great deal of time and expensive equipment to achieve meaningful results. A new method to complete this task uses a rotating mask with slots of three different orientations to collect this data. By scanning over the beam in three different directions, a complete profile for each bunch is built in just seconds, compared to the hours necessary for the previous method. This design was successfully tested using synchrotron radiation emitted by SPEAR3. The profile of the beam was measured in each of the three desired directions. Due to scheduled beam maintenance, only one set of data was completed and more are necessary to solve any remaining issues. The data collected was processed and all of the RMS sizes along the major and minor axes, as well as the tilt of the beam ellipse were measured.

  14. Masked emotional priming beyond global valence activations.

    Science.gov (United States)

    Rohr, Michaela; Degner, Juliane; Wentura, Dirk

    2012-01-01

    An immense body of research demonstrates that emotional facial expressions can be processed unconsciously. However, it has been assumed that such processing takes place solely on a global valence-based level, allowing individuals to disentangle positive from negative emotions but not the specific emotion. In three studies, we investigated the specificity of emotion processing under conditions of limited awareness using a modified variant of an affective priming task. Faces with happy, angry, sad, fearful, and neutral expressions were presented as masked primes for 33 ms (Study 1) or 14 ms (Studies 2 and 3) followed by emotional target faces (Studies 1 and 2) or emotional adjectives (Study 3). Participants' task was to categorise the target emotion. In all three studies, discrimination of targets was significantly affected by the emotional primes beyond a simple positive versus negative distinction. Results indicate that specific aspects of emotions might be automatically disentangled in addition to valence, even under conditions of subjective unawareness.

  15. GABAa agonist reduces visual awareness: a masking-EEG experiment

    NARCIS (Netherlands)

    van Loon, A.M.; Scholte, H.S.; van Gaal, S.; van der Hoort, B.J.J.; Lamme, V.A.F.

    2012-01-01

    Consciousness can be manipulated in many ways. Here, we seek to understand whether two such ways, visual masking and pharmacological intervention, share a common pathway in manipulating visual consciousness. We recorded EEG from human participants who performed a backward-masking task in which they

  16. Mechanisms of Masked Priming: Testing the Entry Opening Model

    Science.gov (United States)

    Wu, Hongmei

    2012-01-01

    Since it was introduced in Forster and Davis (1984), masked priming has been widely adopted in the psycholinguistic research on visual word recognition, but there has been little consensus on its actual mechanisms, i.e. how it occurs and how it should be interpreted. This dissertation addresses two different interpretations of masked priming, one…

  17. Prevalence and persistence of masked hypertension in treated hypertensive patients

    NARCIS (Netherlands)

    Verberk, Willem J.; Thien, Theo; Kroon, Abraham A.; Lenders, Jacques W. M.; van Montfrans, Gert A.; Smit, Andries J.; de Leeuw, Peter W.

    2007-01-01

    Background: Masked hypertension (MH) is defined as a normal blood pressure in the physician's office and an elevated blood pressure when measured out-of-office. The cause of MH may be termed the masked hypertension effect (MHE), and is not restricted to blood-pressure (BP) values around the threshol

  18. General Projective Synchronization and Fractional Order Chaotic Masking Scheme

    Institute of Scientific and Technical Information of China (English)

    Shi-Quan Shao

    2008-01-01

    In this paper, a fractional order chaotic masking scheme used for secure communication is introduced. Based on the general projective synchronization of two coupled fractional Chert systems, a popular masking scheme is designed. Numerical example is given to demonstrate the effectiveness of the proposed method.

  19. Optical vortex coronagraphy from soft spin-orbit masks

    CERN Document Server

    Aleksanyan, Artur

    2016-01-01

    We report on a soft route towards optical vortex coronagraphy based on self-engineered electrically tunable vortex masks based on liquid crystal topological defects. These results suggest that a Nature-assisted technological approach to the fabrication of complex phase masks could be useful in optical imaging whenever optical phase singularities are at play.

  20. 3D Rigorous simulation of mask induced polarization

    NARCIS (Netherlands)

    Wei, X.; Urbach, H.P.; Wachters, A.; Aksenov, Y.

    2005-01-01

    The polarization induced by the mask is studied by using a 3D rigorous model, wich solves Maxwell equations using the finite element method. Teh aerial image depends strongly on the change of polarization induced by the materials, thickness of the layer and pitch of the periodic masks.

  1. Mask Design for the Space Interferometry Mission Internal Metrology

    Science.gov (United States)

    Marx, David; Zhao, Feng; Korechoff, Robert

    2005-01-01

    This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

  2. Silver-palladium braze alloy recovered from masking materials

    Science.gov (United States)

    Cierniak, R.; Colman, G.; De Carlo, F.

    1966-01-01

    Method for recovering powdered silver-palladium braze alloy from an acrylic spray binder and rubber masking adhesive used in spray brazing is devised. The process involves agitation and dissolution of masking materials and recovery of suspended precious metal particles on a filter.

  3. Mask Making: The Use of Expressive Arts with Leadership Development.

    Science.gov (United States)

    Jones, Angela Thomas

    The process of making one's own mask and having one's mask made was offered as an experiential exercise for a group of Outward Bound students training to be Outward Bound instructors. The integration of expressive arts with outdoor experiential education was an attempt to encourage balance between the technical and interpersonal skill development…

  4. Respiratory Protection Provided by Five New Contagion Masks

    Science.gov (United States)

    Guyton, H. Gerald; Decker, Herbert M.

    1963-01-01

    The effectiveness of five recently developed contagion masks in filtering air-borne particles (1 to 5 μ diam) has been reported. One mask, available in four sizes, was 99% efficient. This mask can be reused after sterilization. The other four masks are available in only one size and are intended to be used one time only. Two of these four disposable types were more than 90% efficient but the variability of their respective test results was much greater than that for the reusable mask. The two remaining disposable types were less than 80% efficient. Two of these contagion-mask types were worn by hospital personnel for periods of up to 8 hr to determine the effect of such prolonged use on aerosol filtration efficiency. No significant decrease in filtration efficiency was noted. Physicians, nurses, and other hospital personnel who wear masks will benefit from the increased individual respiratory protection afforded by improved contagion masks. Concurrently, the incidence of hospital patient air-borne infections should be greatly reduced. Images FIG. 1 PMID:13951516

  5. Masking interrupts figure-ground signals in V1

    NARCIS (Netherlands)

    Lamme, V.A.F.; Zipser, K.; Spekreijse, H.

    2002-01-01

    In a backward masking paradigm, a target stimulus is rapidly (<100 msec) followed by a second Stimulus. This typically results in a dramatic decrease in the visibility of the target stimulus. It has been shown that masking reduces responses in V1. It is not known, however, which process in V1 is aff

  6. Mechanisms of Masked Priming: Testing the Entry Opening Model

    Science.gov (United States)

    Wu, Hongmei

    2012-01-01

    Since it was introduced in Forster and Davis (1984), masked priming has been widely adopted in the psycholinguistic research on visual word recognition, but there has been little consensus on its actual mechanisms, i.e. how it occurs and how it should be interpreted. This dissertation addresses two different interpretations of masked priming, one…

  7. Migration from full-head mask to "open-face" mask for immobilization of patients with head and neck cancer.

    Science.gov (United States)

    Li, Guang; Lovelock, D Michael; Mechalakos, James; Rao, Shyam; Della-Biancia, Cesar; Amols, Howard; Lee, Nancy

    2013-09-06

    To provide an alternative device for immobilization of the head while easing claustrophobia and improving comfort, an "open-face" thermoplastic mask was evaluated using video-based optical surface imaging (OSI) and kilovoltage (kV) X-ray radiography. A three-point thermoplastic head mask with a precut opening and reinforced strips was developed. After molding, it provided sufficient visible facial area as the region of interest for OSI. Using real-time OSI, the head motion of ten volunteers in the new mask was evaluated during mask locking and 15minutes lying on the treatment couch. Using a nose mark with reference to room lasers, forced head movement in open-face and full-head masks (with a nose hole) was compared. Five patients with claustrophobia were immobilized with open-face masks, set up using OSI and kV, and treated in 121 fractions, in which 61 fractions were monitored during treatment using real-time OSI. With the open-face mask, head motion was found to be 1.0 ± 0.6 mm and 0.4° ± 0.2° in volunteers during the experiment, and 0.8 ± 0.3 mm and 0.4° ± 0.2° in patients during treatment. These agree with patient motion calculated from pre-/post-treatment OSI and kV data using different anatomical landmarks. In volunteers, the head shift induced by mask-locking was 2.3 ± 1.7 mm and 1.8° ± 0.6°, and the range of forced movements in the open-face and full-head masks were found to be similar. Most (80%) of the volunteers preferred the open-face mask to the full-head mask, while claustrophobic patients could only tolerate the open-face mask. The open-face mask is characterized for its immobilization capability and can immobilize patients sufficiently (< 2 mm) during radiotherapy. It provides a clinical solution to the immobilization of patients with head and neck (HN) cancer undergoing radiotherapy, and is particularly beneficial for claustrophobic patients. This new open-face mask is readily adopted in radiotherapy clinic as a superior alternative to

  8. Automated texture scoring for assessing breast cancer masking risk in full field digital mammography

    DEFF Research Database (Denmark)

    Kallenberg, Michiel Gijsbertus J; Petersen, Kersten; Lilholm, Martin;

    validation. To assess the independency of the texture scores of breast density, density was determined for each image using Volpara. RESULTS: The odds ratios for interval cancer were 1.59 (95%CI: 0.76-3.32), 2.07 (1.02-4.20), and 3.14 (1.60-6.17) for quartile 2, 3 and 4 respectively, relative to quartile 1....... Correlation between the texture scores and breast density was 0.59 (0.52-0.64). Breast density adjusted odds ratios, as determined with logistic regression, were 1.49 (0.71-3.13), 1.58 (0.75-3.33), and 1.97 (0.91-4.27). CONCLUSIONS: The CSAE texture score is independently associated with the risk of having...

  9. Antireflective surface patterned by rolling mask lithography

    Science.gov (United States)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  10. Creation of a virtual cutaneous tissue bank

    Science.gov (United States)

    LaFramboise, William A.; Shah, Sujal; Hoy, R. W.; Letbetter, D.; Petrosko, P.; Vennare, R.; Johnson, Peter C.

    2000-04-01

    Cellular and non-cellular constituents of skin contain fundamental morphometric features and structural patterns that correlate with tissue function. High resolution digital image acquisitions performed using an automated system and proprietary software to assemble adjacent images and create a contiguous, lossless, digital representation of individual microscope slide specimens. Serial extraction, evaluation and statistical analysis of cutaneous feature is performed utilizing an automated analysis system, to derive normal cutaneous parameters comprising essential structural skin components. Automated digital cutaneous analysis allows for fast extraction of microanatomic dat with accuracy approximating manual measurement. The process provides rapid assessment of feature both within individual specimens and across sample populations. The images, component data, and statistical analysis comprise a bioinformatics database to serve as an architectural blueprint for skin tissue engineering and as a diagnostic standard of comparison for pathologic specimens.

  11. Task-Dependent Masked Priming Effects in Visual Word Recognition

    Science.gov (United States)

    Kinoshita, Sachiko; Norris, Dennis

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and non-words do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris and Kinoshita, 2008), and how the task dissociations can be used to understand the early processes in lexical access. PMID:22675316

  12. Task-dependent masked priming effects in visual word recognition.

    Science.gov (United States)

    Kinoshita, Sachiko; Norris, Dennis

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and non-words do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris and Kinoshita, 2008), and how the task dissociations can be used to understand the early processes in lexical access.

  13. Optical image encryption using Kronecker product and hybrid phase masks

    Science.gov (United States)

    Kumar, Ravi; Bhaduri, Basanta

    2017-10-01

    In this paper, we propose a new technique for security enhancement in optical image encryption system. In this technique we have used the Kronecker product of two random matrices along with the double random phase encoding (DRPE) scheme in the Fresnel domain for optical image encryption. The phase masks used here are different than the random masks used in conventional DRPE scheme. These hybrid phase masks are generated by using the combination of random phase masks and a secondary image. For encryption, the input image is first randomized and then the DRPE in the Fresnel domain is performed using the hybrid phase masks. Secondly, the Kronecker product of two random matrices is multiplied with the DRPE output to get the final encoded image for transmission. The proposed technique consists of more unknown keys for enhanced security and robust against various attacks. The simulation results along with effects under various attacks are presented in support of the proposed technique.

  14. Masked Hypertension: How to Identify and When to Treat?

    Science.gov (United States)

    Rizzoni, Damiano

    2016-09-01

    Approximately one out of 7-8 individuals with normal blood pressure (BP) in the clinic or doctor's office and one third of patients with chronic kidney disease with normal clinic BP have elevated ambulatory BP (masked hypertension). Patients with masked hypertension have an increased risk for target organ damage and a two-fold increased risk for cardiovascular events compared to patients with normal clinic and ambulatory BP. Despite this elevated risk for adverse outcomes, patients with masked hypertension have been excluded from hypertension trials because of their normal clinic BP. It is still unknown whether the reduction in target organ damage and adverse cardiovascular outcomes associated with treatment of hypertension extends to patients with masked hypertension. Ongoing and planned interventional studies will provide an answer to this crucial question in a few years. At present, it seems reasonable to follow the suggestion of current European guidelines, that lifestyle measures and drug treatment should be considered in the presence of masked hypertension.

  15. Study of critical dimension uniformity (CDU) using a mask inspector

    Science.gov (United States)

    Lin, Mei-Chun; Yu, Ching-Fang; Lai, Mei-Tsu; Hsu, Luke T. H.; Chin, Angus; Yen, Anthony

    2012-11-01

    This paper studies the repeatability and the reliability of CDUs from a mask inspector and their correlation with CD SEM measurements on various pattern attributes such as feature sizes, tones, and orientations. Full-mask image analysis with a mask inspector is one of potential solutions for overcoming the sampling rate limitation of a mask CD SEM. By comparing the design database with the inspected dimension, the complete CDU behavior of specific patterns can be obtained without extra work and tool time. These measurements can be mapped and averaged over various spatial lengths to determine changes in relative CDU across the mask. Eventually, success of this methodology relies on the optical system of the inspector being highly stable.

  16. Using Volumetric Breast Density to Quantify the Potential Masking Risk of Mammographic Density.

    Science.gov (United States)

    Destounis, Stamatia; Johnston, Lisa; Highnam, Ralph; Arieno, Andrea; Morgan, Renee; Chan, Ariane

    2017-01-01

    The purposes of this study were to compare BI-RADS density categories with quantitative volumetric breast density (VBD) for the reporting of mammographic sensitivity and to identify which patient factors are most predictive of a diagnosis of interval cancer of the breast versus screen-detected cancer. This retrospective study included screen-detected cancers (n = 652) and interval cancers (n = 119) identified between January 2009 and December 2012. Multivariate logistic regression analysis was used to determine which patient factors are predictive of a diagnosis of interval cancer. Sensitivity (screen-detected cancer / [screen-detected cancer + interval cancer]) was determined with the BI-RADS 4th edition density categories and an automated equivalent density grade obtained with a proprietary tool. Sensitivity changes within automated density grade categories were investigated by use of quantitative thresholds at the midpoints of each category. In univariate analysis, age, menopausal status, and breast density were associated with a diagnosis of interval cancer. Of these risk factors, breast density was the only independent factor whether it was assessed by visual BI-RADS category (odds ratio, 3.54; 95% CI, 1.55-8.10), automated density grade (odds ratio, 4.68; 95% CI, 2.26-9.67), or VBD (odds ratio, 4.51; 95% CI, 1.92-10.61). Sensitivity decreased consistently across increasing automated density grade categories from fatty to extremely dense (95%, 89%, 83%, 65%) and less so for visual BI-RADS (82%, 90%, 84%, 66%). Further dichotomization with VBD cutoffs showed a striking linear relation between VBD and sensitivity (R(2) = 0.959). In this study, breast density was the only risk factor significantly associated with a diagnosis of interval cancer versus screen-detected cancer. Quantitative VBD captures the potential masking risk of breast density more precisely than does the widely used visual BI-RADS density classification system.

  17. [Clark's head tent or "small mask"? Value of high oxygen flows administered through a mask].

    Science.gov (United States)

    Landrieu, J P; Milhaud, A; Brille, P; Hermant, A; Tinturier, F

    1991-01-01

    The measurement of transcutaneous PtcO2 in eight normal adults prove a comparable efficacy of 50 l.min-1 O2 through facial "small mask" (61.5 kPa; 463 mmHg) and 20 l.min-1 O2 through head tent (65.1 kPa; 490 mmHg). First procedure, inexpensive, is very simple to use.

  18. The influence of masked hypertension on the right ventricle: is everything really masked?

    Science.gov (United States)

    Tadic, Marijana; Cuspidi, Cesare; Vukomanovic, Vladan; Celic, Vera; Pavlovic, Tatjana; Kocijancic, Vesna

    2016-04-01

    We sought to investigate right ventricular (RV) structure, function, and mechanics in subjects with masked hypertension (MH), normotensive, and sustained hypertensive patients. This cross-sectional study included 186 untreated subjects who underwent 24-hour ambulatory blood pressure (BP) monitoring and complete two-dimensional echocardiographic (2DE) examination including multilayer strain analysis. MH was diagnosed if clinic BP was normal (subjects with sustained hypertension. RV structure, function, and deformation are significantly changed in subjects with MH and sustained hypertension.

  19. I-94 Automation FAQs

    Data.gov (United States)

    Department of Homeland Security — In order to increase efficiency, reduce operating costs and streamline the admissions process, U.S. Customs and Border Protection has automated Form I-94 at air and...

  20. Automated Vehicles Symposium 2015

    CERN Document Server

    Beiker, Sven

    2016-01-01

    This edited book comprises papers about the impacts, benefits and challenges of connected and automated cars. It is the third volume of the LNMOB series dealing with Road Vehicle Automation. The book comprises contributions from researchers, industry practitioners and policy makers, covering perspectives from the U.S., Europe and Japan. It is based on the Automated Vehicles Symposium 2015 which was jointly organized by the Association of Unmanned Vehicle Systems International (AUVSI) and the Transportation Research Board (TRB) in Ann Arbor, Michigan, in July 2015. The topical spectrum includes, but is not limited to, public sector activities, human factors, ethical and business aspects, energy and technological perspectives, vehicle systems and transportation infrastructure. This book is an indispensable source of information for academic researchers, industrial engineers and policy makers interested in the topic of road vehicle automation.

  1. Automating the Media Center.

    Science.gov (United States)

    Holloway, Mary A.

    1988-01-01

    Discusses the need to develop more efficient information retrieval skills by the use of new technology. Lists four stages used in automating the media center. Describes North Carolina's pilot programs. Proposes benefits and looks at the media center's future. (MVL)

  2. Hydrometeorological Automated Data System

    Data.gov (United States)

    National Oceanic and Atmospheric Administration, Department of Commerce — The Office of Hydrologic Development of the National Weather Service operates HADS, the Hydrometeorological Automated Data System. This data set contains the last 48...

  3. Automated Vehicles Symposium 2014

    CERN Document Server

    Beiker, Sven; Road Vehicle Automation 2

    2015-01-01

    This paper collection is the second volume of the LNMOB series on Road Vehicle Automation. The book contains a comprehensive review of current technical, socio-economic, and legal perspectives written by experts coming from public authorities, companies and universities in the U.S., Europe and Japan. It originates from the Automated Vehicle Symposium 2014, which was jointly organized by the Association for Unmanned Vehicle Systems International (AUVSI) and the Transportation Research Board (TRB) in Burlingame, CA, in July 2014. The contributions discuss the challenges arising from the integration of highly automated and self-driving vehicles into the transportation system, with a focus on human factors and different deployment scenarios. This book is an indispensable source of information for academic researchers, industrial engineers, and policy makers interested in the topic of road vehicle automation.

  4. Disassembly automation automated systems with cognitive abilities

    CERN Document Server

    Vongbunyong, Supachai

    2015-01-01

    This book presents a number of aspects to be considered in the development of disassembly automation, including the mechanical system, vision system and intelligent planner. The implementation of cognitive robotics increases the flexibility and degree of autonomy of the disassembly system. Disassembly, as a step in the treatment of end-of-life products, can allow the recovery of embodied value left within disposed products, as well as the appropriate separation of potentially-hazardous components. In the end-of-life treatment industry, disassembly has largely been limited to manual labor, which is expensive in developed countries. Automation is one possible solution for economic feasibility. The target audience primarily comprises researchers and experts in the field, but the book may also be beneficial for graduate students.

  5. A prototype erodible mask delivery system for the excimer laser.

    Science.gov (United States)

    Maloney, R K; Friedman, M; Harmon, T; Hayward, M; Hagen, K; Gailitis, R P; Waring, G O

    1993-04-01

    The authors developed an erodible mask delivery system for the argon-fluoride 193-nm excimer laser, which offers the possibility of correcting hyperopia and astigmatism as well as myopia. Masks were made of polymethylmethacrylate on a quartz window, with intended corrections for myopia and hyperopia of 2.5 and 5 diopters (D). Ablations using the mask and control ablations using an expanding diaphragm were performed in 30 eyes of 15 pigmented rabbits with an Excimed UV200 laser (Summit Technology, Inc, Waltham, MA). The rabbits were followed for 134 days with regular biomicroscopy and retinoscopic examination by two observers. Ablations with the mask to correct myopia were successful and produced stable corrections, although the higher-power mask produced undercorrections. Hyperopic masks produced paradoxic myopic corrections, possibly due to the lack of a transition zone at the edge of the mask. Corneas ablated with the mask had less sub-epithelial haze than those ablated with the diaphragm at all examinations. Results of histopathologic examination showed epithelial hyperplasia over the ablation zone in all eyes. Dichlorotriazinyl aminofluorescein collagen staining showed subepithelial new collagen in all eyes, but there was no relation between the depth of ablation at any point on the cornea and the amount of new collagen deposited there. Myopic ablations are feasible with the erodible mask, although additional calibration is needed. Hyperopic ablations were unsuccessful with the current design. Corneas ablated with the mask may be clearer than corneas ablated with the diaphragm, possibly due to a smoother ablated surface. Regression of effect after laser ablation in the rabbit model is likely due more to epithelial hyperplasia than to stromal remodeling.

  6. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  7. Scalable Automated Model Search

    Science.gov (United States)

    2014-05-20

    of processing. 6. FUTURE WORK We note that these optimizations are just the tip of the iceberg in solving this problem faster. Advanced model ...Scalable Automated Model Search Evan Sparks Electrical Engineering and Computer Sciences University of California at Berkeley Technical Report No...2014 to 00-00-2014 4. TITLE AND SUBTITLE Scalable Automated Model Search 5a. CONTRACT NUMBER 5b. GRANT NUMBER 5c. PROGRAM ELEMENT NUMBER 6. AUTHOR

  8. Marketing automation supporting sales

    OpenAIRE

    Sandell, Niko

    2016-01-01

    The past couple of decades has been a time of major changes in marketing. Digitalization has become a permanent part of marketing and at the same time enabled efficient collection of data. Personalization and customization of content are playing a crucial role in marketing when new customers are acquired. This has also created a need for automation to facilitate the distribution of targeted content. As a result of successful marketing automation more information of the customers is gathered ...

  9. Automation of Diagrammatic Reasoning

    OpenAIRE

    Jamnik, Mateja; Bundy, Alan; Green, Ian

    1997-01-01

    Theorems in automated theorem proving are usually proved by logical formal proofs. However, there is a subset of problems which humans can prove in a different way by the use of geometric operations on diagrams, so called diagrammatic proofs. Insight is more clearly perceived in these than in the corresponding algebraic proofs: they capture an intuitive notion of truthfulness that humans find easy to see and understand. We are identifying and automating this diagrammatic reasoning on mathemat...

  10. Shielded cells transfer automation

    Energy Technology Data Exchange (ETDEWEB)

    Fisher, J J

    1984-01-01

    Nuclear waste from shielded cells is removed, packaged, and transferred manually in many nuclear facilities. Radiation exposure is absorbed by operators during these operations and limited only through procedural controls. Technological advances in automation using robotics have allowed a production waste removal operation to be automated to reduce radiation exposure. The robotic system bags waste containers out of glove box and transfers them to a shielded container. Operators control the system outside the system work area via television cameras. 9 figures.

  11. Instant Sikuli test automation

    CERN Document Server

    Lau, Ben

    2013-01-01

    Get to grips with a new technology, understand what it is and what it can do for you, and then get to work with the most important features and tasks. A concise guide written in an easy-to follow style using the Starter guide approach.This book is aimed at automation and testing professionals who want to use Sikuli to automate GUI. Some Python programming experience is assumed.

  12. ACCOUNTING AUTOMATIONS RISKS

    OpenAIRE

    Муравський, В. В.; Хома, Н. Г.

    2015-01-01

    Accountant accepts active voice in organization of the automated account in the conditions of the informative systems introduction in enterprise activity. Effective accounting automation needs identification and warning of organizational risks. Authors researched, classified and generalized the risks of introduction of the informative accounting systems. The ways of liquidation of the organizational risks sources andminimization of their consequences are gives. The method of the effective con...

  13. Automated security management

    CERN Document Server

    Al-Shaer, Ehab; Xie, Geoffrey

    2013-01-01

    In this contributed volume, leading international researchers explore configuration modeling and checking, vulnerability and risk assessment, configuration analysis, and diagnostics and discovery. The authors equip readers to understand automated security management systems and techniques that increase overall network assurability and usability. These constantly changing networks defend against cyber attacks by integrating hundreds of security devices such as firewalls, IPSec gateways, IDS/IPS, authentication servers, authorization/RBAC servers, and crypto systems. Automated Security Managemen

  14. Automated Lattice Perturbation Theory

    Energy Technology Data Exchange (ETDEWEB)

    Monahan, Christopher

    2014-11-01

    I review recent developments in automated lattice perturbation theory. Starting with an overview of lattice perturbation theory, I focus on the three automation packages currently "on the market": HiPPy/HPsrc, Pastor and PhySyCAl. I highlight some recent applications of these methods, particularly in B physics. In the final section I briefly discuss the related, but distinct, approach of numerical stochastic perturbation theory.

  15. Marketing automation supporting sales

    OpenAIRE

    Sandell, Niko

    2016-01-01

    The past couple of decades has been a time of major changes in marketing. Digitalization has become a permanent part of marketing and at the same time enabled efficient collection of data. Personalization and customization of content are playing a crucial role in marketing when new customers are acquired. This has also created a need for automation to facilitate the distribution of targeted content. As a result of successful marketing automation more information of the customers is gathered ...

  16. Direct Creation of Biopatterns via a Combination of Laser-Based Techniques and Click Chemistry.

    Science.gov (United States)

    Chatzipetrou, Marianneza; Massaouti, Maria; Tsekenis, George; Trilling, Anke K; van Andel, Esther; Scheres, Luc; Smulders, Maarten M J; Zuilhof, Han; Zergioti, Ioanna

    2017-01-31

    In this paper, we present the immobilization of thiol-modified aptamers on alkyne- or alkene-terminated silicon nitride surfaces by laser-induced click chemistry reactions. The aptamers are printed onto the surface by laser-induced forward transfer (LIFT), which also induces the covalent bonding of the aptamers by thiol-ene or thiol-yne reactions that occur upon UV irradiation of the thiol-modified aptamers with ns laser pulses. This combination of LIFT and laser-induced click chemistry allows the creation of high-resolution patterns without the need for masks. Whereas the click chemistry already takes place during the printing process (single-step process) by the laser pulse used for the printing process, further irradiation of the LIFT-printed aptamers by laser pulses (two-step process) leads to a further increase in the immobilization efficiency.

  17. Objective measures of binaural masking level differences and comodulation masking release based on late auditory evoked potentials

    DEFF Research Database (Denmark)

    Epp, Bastian; Yasin, Ifat; Verhey, Jesko L.

    2013-01-01

    The audibility of important sounds is often hampered due to the presence of other masking sounds. The present study investigates if a correlate of the audibility of a tone masked by noise is found in late auditory evoked potentials measured from human listeners. The audibility of the target sound...

  18. A user-programmable link between data preparation and mask manufacturing equipment

    Science.gov (United States)

    Zhang, Weidong; Davis, Grant; Sahouria, Emile; Schulze, Steffen; Saad, Mohammed; Seyfarth, Arne; Poortinga, Eric

    2007-10-01

    In order to fully exploit the design knowledge during the operation of mask manufacturing equipment, as well as to enable the efficient feedback of manufacturing information upstream into the design chain, close communication links between the data processing domain and the machine are necessary. With shrinking design rules and modeling technology required to drive simulations and corrections, the amount and variety of measurements, for example, is steadily growing. This requires a flexible and automated setup of parameters and location information and their communication with the machine. The paper will describe a programming interface based on the Tcl/Tk language that contains a set of frequently reoccurring functions for data extraction and search, site characterization, site filtering, and coordinate transfer. It enables the free programming of the links, adapting to the flow and the machine needs. The interface lowers the effort to connect to new tools with specific measurement capabilities, and it reduces the setup and measurement time. The interface is capable of handling all common mask writer formats and their jobdecks, as well as OASIS and GDSII data. The application of this interface is demonstrated for the Carl Zeiss AIMS TM system.

  19. Elements of EAF automation processes

    Science.gov (United States)

    Ioana, A.; Constantin, N.; Dragna, E. C.

    2017-01-01

    Our article presents elements of Electric Arc Furnace (EAF) automation. So, we present and analyze detailed two automation schemes: the scheme of electrical EAF automation system; the scheme of thermic EAF automation system. The application results of these scheme of automation consists in: the sensitive reduction of specific consummation of electrical energy of Electric Arc Furnace, increasing the productivity of Electric Arc Furnace, increase the quality of the developed steel, increasing the durability of the building elements of Electric Arc Furnace.

  20. From Business Administration to Business Creation: The Case of the Kalevala Global Business Creation School

    Directory of Open Access Journals (Sweden)

    Marko Seppä

    2012-06-01

    Full Text Available Are there any businesses left to administer? The question is of course rhetorical and aimed at underscoring how several societies are more severely in need of creators of new businesses than managers of established ones. And yet, nearly all universities only produce masters of business administration, at best. Apart from theoretical research about business creation, and the education of masters of such research, universities are generally not equipped to produce knowledge for business creation or to produce masters of business creation. This conceptual article calls for a new, complementary approach to research and education, around the theme of global business creation. Due to the limitations and restrictions related to the traditions and practices of the science of business administration, where the means justify the ends, a new exploratory field coined as the “Art of Business Creation,” where the end justifies the means, is being explored for some inspiration. For a concrete solution, the concept of a globally distributed, enterprise-centric, entrepreneurial-faculty-driven, open-innovation-based, and social-media-empowered university entity is depicted in this article. It is a new-generation private-public-partnership and “Living Lab 2.0” referred to as Kalevala Global Business Creation School. The conceptualization draws from observations and action research during the Global Venture Lab Finland experiment at the University of Jyväskylä from 2007 to 2011.

  1. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

    Science.gov (United States)

    Hector, Scott

    2005-11-01

    The extension of optical projection lithography through immersion to patterning features with half pitch cash flow models to predict the affordable R&D while maintaining industry accepted internal rates of return. The results have been compared to estimates of the total R&D cost to bring a new generation of mask equipment to market for various types of tools. The analysis revealed that affordability of the required R&D is a significant problem for many suppliers of mask-making equipment. Consortia such as SEMATECH and Selete have played an important role in cost sharing selected mask equipment and material development projects. Governments in the United States, in Europe and in Japan have also helped equipment suppliers with support for R&D. This paper summarizes the challenging business model for mask equipment suppliers and highlight government support for mask equipment and materials development.

  2. Challenges of the mask manufacturing approaching physical limits

    Science.gov (United States)

    Nesladek, Pavel

    2007-05-01

    Over the past 25 years, following the International Technology Roadmap for Semiconductors , 2006 [1], the main feature size of integrated circuits has decreased from approximately 3 μm to 70 nm. With feature sizes well below the exposure wavelength of the stepper, resolution enhancement features such as serifs, scatter-bars, and hammer heads are added to the mask design. Given a 4:1 reduction from mask to wafer, the resolution enhancement features, such as scatter bars, are roughly the same size as main features on the wafer. Recently, with the reduction of mask feature size, mask-manufacturing technology faces several problems in satisfying customer needs for resolution, CD uniformity, and CD linearity. The problems result, in part, as the legacy of material and process choices made in the early days of mask making. For example, the use of chrome as an absorber was suitable material choice for wet etch binary mask processes, but this material is now seen as problematic current dry etch process. Another general source of problems for the mask industry is its small size relative to wafer manufacturing. As a result, vendors focus material and equipment development efforts on wafer, and then make adaptations to fit mask-making requirements. Nowadays the patterns of high-end lithographic masks are written by variable shaped beam 50 kV e-beam writers with minimum beam size of as little as few nm. However, the latent pattern after writing differs significantly from the final pattern on the mask due to interactions during post exposure bake, resist development, and etch processes so the final pattern is a convolution of these effects. The parameters of interest are resolution, critical dimension uniformity (CDU), pattern fidelity, CD linearity, iso-dense as well as clear-dark bias, transmission of the transparent substrate and absorber, and birefringence. Besides these requirements, there are implicit, not specified, expectations that the mask has to fulfill. To this

  3. Cosmological particle creation in the lab?

    CERN Document Server

    Schützhold, Ralf

    2012-01-01

    One of the most striking examples for the production of particles out of the quantum vacuum due to external conditions is cosmological particle creation, which is caused by the expansion or contraction of the Universe. Already in 1939, Schr\\"odinger understood that the cosmic evolution could lead to a mixing of positive and negative frequencies and that this "would mean production or annihilation of matter, merely by the expansion". Later this phenomenon was derived via more modern techniques of quantum field theory in curved space-times by Parker (who apparently was not aware of Schr\\"odinger's work) and subsequently has been studied in numerous publications. Even though cosmological particle creation typically occurs on extremely large length scales, it is one of the very few examples for such fundamental effects where we actually may have observational evidence: According to the inflationary model of cosmology, the seeds for the anisotropies in the cosmic microwave background (CMB) and basically all large ...

  4. [Creation and management of organizational knowledge].

    Science.gov (United States)

    Shinyashiki, Gilberto Tadeu; Trevizan, Maria Auxiliadora; Mendes, Isabel Amélia

    2003-01-01

    With a view to creating and establishing a sustainable position of competitive advantage, the best organizations are increasingly investing in the application of concepts such as learning, knowledge and competency. The organization's creation or acquisition of knowledge about its actions represents an intangible resource that is capable of conferring a competitive advantage upon them. This knowledge derives from interactions developed in learning processes that occur in the organizational environment. The more specific characteristics this knowledge demonstrates in relation to the organization, the more it will become the foundation of its core competencies and, consequently, an important strategic asset. This article emphasizes nurses' role in the process of knowledge management, placing them in the intersection between horizontal and vertical information levels as well as in the creation of a sustainable competitive advantage. Authors believe that this contribution may represent an opportunity for a reflection about its implications for the scenarious of health and nursing practices.

  5. Cosmological particle creation in conformal gravity

    Directory of Open Access Journals (Sweden)

    Berezin Victor

    2016-01-01

    Full Text Available We constructed the conformally invariant model for scalar particle creation induced by strong gravitational fields. Starting from the “usual” hydrodynamical description of the particle motion written in the Eulerian coordinates we substituted the particle number conservation law (which enters the formalism by “the particle creation law”, proportional to the square of the Weyl tensor (following the famous result by Ya. B. Zel‘dovich and A. A. Starobinsky. Then, demanding the conformal invariance of the whole dynamical system, we have got both the (Weyl-conformal gravity and the Einstein–Hilbert–dilaton gravity action integral. Thus, we obtained something like the induced gravity suggested first by A. D. Sakharov. It is shown that the resulting system is self-consistent. Some future developments of the theory are discussed in the concluding Chapter.

  6. Technological Creation Fuels Oil Giant's Development

    Institute of Scientific and Technical Information of China (English)

    Mu Zongyan

    2006-01-01

    @@ Sinopec has focused itself on development, conversion and extension of core technologies and specialized technologies in the recent years to fuel its main business development. With the efforts for IPR protection, Sinopec has achieved a series of technological creation results,which lead to huge social and economic benefits. Sinopec has also seen a significant change in the total amount,structure and quality of its assets thanks to those creation results. The sales income of Sinopec, for the first time,topped 800 billion yuan in 2005 with the profits and taxes exceeding 100 billion yuan. With the core competitiveness boosted continually, Sinopec rose to No.31 in the ranking of Fortune Global Top 500.

  7. The Creation and Destruction of Social Capital

    DEFF Research Database (Denmark)

    Svendsen, Gunnar Lind Haase; Svendsen, Gert Tinggaard

    ‘A welcome contribution to scholarly economic and public policy debates, The Creation and Destruction of Social Capital is written for advanced students yet offers insights critical to better understanding micro and macro economics alike.' - Willis M. Buhle, The Midwest Book Review ‘The Svendsens...... in to crafting this study.' - From the foreword by Elinor Ostrom Is social capital the ‘missing link' in economics? In this vital new book, the authors argue that the ‘forgotten' production factor of social capital is as crucial in economic decision-making as the other more traditional factors of production...... such as physical, financial and human capital. They attempt to bridge the gap between theory and reality by examining the main factors that determine entrepreneurship, co-operative movements and the creation and destruction of social capital....

  8. Making sense of Islamic creationism in Europe.

    Science.gov (United States)

    Hameed, Salman

    2015-05-01

    Islamic creationism has been noted as a serious concern in Europe. There have been reports of boycotts of university evolution lectures and, in one extreme case, even a threat of violence. While religious objections are indeed at play in some cases, our understanding of the rise of Islamic creationism should also take into account socioeconomic disparities and its impact on education for Muslim minorities in Europe. Furthermore, the broader narrative of rejection of evolution in Europe, for some Muslims, may be bound up in reactions to the secular culture and in the formation of their own minority religious identity. On the other hand, the stories of Muslim rejection of evolution in media end up reinforcing the stereotype of Muslims as "outsiders" and a threat to the European education system. A nuanced understanding of this dynamic may benefit those who support both the propagation of good science and favor cultural pluralism.

  9. Networks and knowledge creation for meaning

    DEFF Research Database (Denmark)

    Brink, Tove

    2016-01-01

    The research in this paper reveals how business networks can create organisational knowledge to provide meaning for enabling innovation and reduction of Levelized Cost Of Energy (LCOE)? The research was conducted from June 2014 to May 2015, using a qualitative deductive research approach...... the meaning necessary for innovation. In the organising process sources of systematic storage in the enterprise, education and training and the essential knowledge creation through people need to be emphasised on the creation of meaning for innovation and reduction of LCOE. Each of these sources is important...... and due to the organising process highly valuable findings regarding innovation can be utilised both for improved central decisions and for improved application of knowledge locally when the meaning is established. Further research is needed for elaboration of the business network frame and the organising...

  10. How spatial context influences entrepreneurial value creation

    DEFF Research Database (Denmark)

    Müller, Sabine

    2014-01-01

    This paper investigates how rural communities are enriched by entrepreneurial value-creating activities that go beyond job creation and growth. In addition, this study explores how spatial context influences these value-creating activities. This qualitative case-based study shows that rural......-being of the community. Thus, this study contributes to an in-depth understanding of how and why entrepreneurship can create multiple forms of value in rural areas as well as how value creation behaviours are motivated by the spatial context. In addition, it provides explanations why not all rural entrepreneurs...... contribute or at least intend to contribute equally and in a similar way to local development. Thus, by adding contextualized explanations of rural entrepreneurial behaviour to the literature, this study places itself in the recent debate and call for contextualizing entrepreneurship research....

  11. Particle creation phenomenology and conformal gravity

    CERN Document Server

    Berezin, Victor; Eroshenko, Yury

    2016-01-01

    We constructed the conformally invariant model for scalar particle creation induced by strong gravitational fields. Starting from the "usual" hydrodynamical description of the particle motion written in the Eulerian coordinates we substituted the particle number conservation law (which enters the formalism) by "the particle creation law", proportional to the square of the Weyl tensor (following the famous result by Ya. B. Zel`dovich and A. A.Starobinsky). Then, demanding the conformal invariance of the whole dynamical system, we have got both the (Weyl)-conformal gravity and the Einstein-Hilbert-dilaton gravity action integral. Thus, we obtained something like the induced gravity suggested first by A. D. Sakharov. It is shown that the resulting system is self-consistent. Some future developments of the theory are discussed in the Conclusion.

  12. The creation and circulation of public geographies

    OpenAIRE

    Kitchin, Rob; Linehan, Denis; O'Callaghan, Cian; Lawton, Philip

    2013-01-01

    In response to the commentaries, we discuss further how social media disrupts and remakes the creation and circulation of geographical knowledges and potentially reconfigures the moral economy of the social sciences. In particular, we examine questions of what is meant by public geography, the publics which such geographies serve, alternative and complementary approaches to social media, the politics of authorship within collective blogs, the politics and mechanisms of knowledge c...

  13. Logistics potentials in business competitive advantage creation

    OpenAIRE

    Rafał Matwiejczuk

    2013-01-01

    Background: Companies constantly search for ways to achieve and sustain long-term competitive advantage. Among the factors influencing the competitive advantage creation there are so called logistics potentials, which constitute a component part of a business strategic potentials. Logistics resources, logistics capabilities and logistics competences are the main components of the logistics potentials structure and hierarchy. Methods: In order to recognize the logistics potentials which de...

  14. Perspective Method of Betavoltaic Converter Creation

    Directory of Open Access Journals (Sweden)

    K.V. Rudenko

    2016-06-01

    Full Text Available Some results on planar diode structure creation by the method of a plasma-immersion ion implantation is presented in this paper. Obtained leakage current ~ 1 uA/cm2 at reverse voltage – 1 V. The cryogenic plasmochemical silicon etching process is developed, able to form the structured silicon layer with system of deep holes with high aspect ratio.

  15. Technological Opportunities and New Firm Creation

    OpenAIRE

    Scott Shane

    2001-01-01

    Research on the creation of new high-technology companies has typically focused either on industry-level factors such as market structure and technology regime or on individual-level factors such as the work experience of entrepreneurs. This study complements these approaches by examining the effect of technological opportunities on firm formation. In particular, the study shows that the probability that an invention will be commercialized through firm formation is influenced by its importanc...

  16. Chôra : Creation and Pathology

    DEFF Research Database (Denmark)

    Isar, Nicoletta

    2009-01-01

    Plato's dialogue the Timaeus describes not only the making of the cosmos (order), but also the condition of what is not order, neither for the human body nor for the universe. What is disorder in cosmogonic terms it is disease for the human body. Timaeus applies to the concept chôra in discussing....... http://www.ejop.org/archives/2009/05/chara_creation.html...

  17. Multi-pair states in electron-positron pair creation

    Science.gov (United States)

    Wöllert, Anton; Bauke, Heiko; Keitel, Christoph H.

    2016-09-01

    Ultra strong electromagnetic fields can lead to spontaneous creation of single or multiple electron-positron pairs. A quantum field theoretical treatment of the pair creation process combined with numerical methods provides a description of the fermionic quantum field state, from which all observables of the multiple electron-positron pairs can be inferred. This allows to study the complex multi-particle dynamics of electron-positron pair creation in-depth, including multi-pair statistics as well as momentum distributions and spin. To illustrate the potential benefit of this approach, it is applied to the intermediate regime of pair creation between nonperturbative Schwinger pair creation and perturbative multiphoton pair creation where the creation of multi-pair states becomes nonnegligible but cascades do not yet set in. Furthermore, it is demonstrated how spin and helicity of the created electrons and positrons are affected by the polarization of the counterpropagating laser fields, which induce the creation of electron-positron pairs.

  18. Role of Waste Management in Wealth Creation in Nigeria ...

    African Journals Online (AJOL)

    Role of Waste Management in Wealth Creation in Nigeria- Evidences From Lagos ... and how waste recycling affects the creation of small or large business ventures ... in the processes as this would help to create business for entrepreneurs.

  19. Particle creation rate for dynamical black holes

    Energy Technology Data Exchange (ETDEWEB)

    Firouzjaee, Javad T. [School of Astronomy, Institute for Research in Fundamental Sciences (IPM), Tehran (Iran, Islamic Republic of); University of Oxford, Department of Physics (Astrophysics), Oxford (United Kingdom); Ellis, George F.R. [University of Cape Town, Mathematics and Applied Mathematics Department, Rondebosch (South Africa)

    2016-11-15

    We present the particle creation probability rate around a general black hole as an outcome of quantum fluctuations. Using the uncertainty principle for these fluctuation, we derive a new ultraviolet frequency cutoff for the radiation spectrum of a dynamical black hole. Using this frequency cutoff, we define the probability creation rate function for such black holes. We consider a dynamical Vaidya model and calculate the probability creation rate for this case when its horizon is in a slowly evolving phase. Our results show that one can expect the usual Hawking radiation emission process in the case of a dynamical black hole when it has a slowly evolving horizon. Moreover, calculating the probability rate for a dynamical black hole gives a measure of when Hawking radiation can be killed off by an incoming flux of matter or radiation. Our result strictly suggests that we have to revise the Hawking radiation expectation for primordial black holes that have grown substantially since they were created in the early universe. We also infer that this frequency cut off can be a parameter that shows the primordial black hole growth at the emission moment. (orig.)

  20. Creation of Reversible Cholestatic Rat Model

    Science.gov (United States)

    Subhas, Gokulakkrishna

    2011-01-01

    Cholestasis is a clinical condition commonly encountered by both surgeons and gastroenterologists. Cholestasis can cause various physiological changes and affect the nutritional status and surgical outcomes. Study of the pathophysiological changes occurring in the liver and other organs is of importance. Various studies have been done in cholestatic rat models. We used a reversible cholestatic rat model in our recent study looking at the role of methylprednisolone in the ischemia reperfusion injury. Various techniques for creation of a reversible cholestatic model have been described. Creation of a reversible cholestatic rat model can be challenging in view of the smaller size and unique hepatopancreatobiliary anatomy in rats. This video article demonstrates the creation of a reversible cholestatic model. This model can be used in various studies, such as looking at the changes in nutritional, physiological, pathological, histological and immunological changes in the gastrointestinal tract. This model can also be used to see the effects of cholestasis and various therapeutic interventions on major hepatic surgeries. PMID:21633335

  1. Particle creation rate for dynamical black holes

    Science.gov (United States)

    Firouzjaee, Javad T.; Ellis, George F. R.

    2016-11-01

    We present the particle creation probability rate around a general black hole as an outcome of quantum fluctuations. Using the uncertainty principle for these fluctuation, we derive a new ultraviolet frequency cutoff for the radiation spectrum of a dynamical black hole. Using this frequency cutoff, we define the probability creation rate function for such black holes. We consider a dynamical Vaidya model and calculate the probability creation rate for this case when its horizon is in a slowly evolving phase. Our results show that one can expect the usual Hawking radiation emission process in the case of a dynamical black hole when it has a slowly evolving horizon. Moreover, calculating the probability rate for a dynamical black hole gives a measure of when Hawking radiation can be killed off by an incoming flux of matter or radiation. Our result strictly suggests that we have to revise the Hawking radiation expectation for primordial black holes that have grown substantially since they were created in the early universe. We also infer that this frequency cut off can be a parameter that shows the primordial black hole growth at the emission moment.

  2. Supercrowding: weakly masking a target expands the range of crowding.

    Science.gov (United States)

    Vickery, Timothy J; Shim, Won Mok; Chakravarthi, Ramakrishna; Jiang, Yuhong V; Luedeman, Robert

    2009-02-10

    Crowding is impairment of peripheral object identification by nearby objects. Critical spacing (the minimum target-flanker distance that does not produce crowding) scales with target eccentricity and is consistently reported as roughly equal to or less than 50% of target eccentricity (0.5e). This study demonstrates that crowding occurs far beyond the typical critical spacing when the target is weakly masked by a surrounding contour or backwards pattern mask. A target was presented at a peripheral location on every trial and participants reported its orientation. Flankers appeared at target-flanker distances of 0.3-0.7e, or were absent. The target was presented with or without a mask. When flankers were absent, the masks only mildly impaired performance. When flankers were present but the mask was absent, target identification was nearly perfect at wide target-flanker distances (0.5e-0.7e). However, when flankers were present and the target was masked, performance dropped significantly, even when target-flanker distances far exceeded the typical crowding range. This phenomenon ("supercrowding") shares critical features with standard crowding: flankers similar to the target impair performance more than dissimilar flankers, and the characteristic anisotropic profile of crowding is preserved. Supercrowding may reflect a general interaction between crowding and other forms of masking.

  3. Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin Edward; Belikov, Ruslan; Guyon, Olivier; Balasubramanian, Kunjithapatham; Wilson, Dan

    2013-01-01

    Recent advances in coronagraph technologies for exoplanet imaging have achieved contrasts close to 1e10 at 4 lambda/D and 1e-9 at 2 lambda/D in monochromatic light. A remaining technological challenge is to achieve high contrast in broadband light; a challenge that is largely limited by chromaticity of the focal plane mask. The size of a star image scales linearly with wavelength. Focal plane masks are typically the same size at all wavelengths, and must be sized for the longest wavelength in the observational band to avoid starlight leakage. However, this oversized mask blocks useful discovery space from the shorter wavelengths. We present here the design, development, and testing of an achromatic focal plane mask based on the concept of optical filtering by a diffractive optical element (DOE). The mask consists of an array of DOE cells, the combination of which functions as a wavelength filter with any desired amplitude and phase transmission. The effective size of the mask scales nearly linearly with wavelength, and allows significant improvement in the inner working angle of the coronagraph at shorter wavelengths. The design is applicable to almost any coronagraph configuration, and enables operation in a wider band of wavelengths than would otherwise be possible. We include initial results from a laboratory demonstration of the mask with the Phase Induced Amplitude Apodization coronagraph.

  4. Application of DBM tool for detection of EUV mask defect

    Science.gov (United States)

    Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Yang, Hyunjo; Yim, Donggyu; Park, Byeongjun; Maruyama, Kotaro; Yamamoto, Masahiro

    2013-04-01

    Extreme ultraviolet lithography (EUVL) is one of the most leading lithography technologies for high volume manufacturing. The EUVL is based on reflective optic system therefore critical patterning issues are arisen from the surface of photomask. Defects below and inside of the multilayer or absorber of EUV photomask is one of the most critical issues to implement EUV lithography in mass production. It is very important to pick out and repair printable mask defects. Unfortunately, however, infrastructure for securing the defect free photomask such as inspection tool is still under development furthermore it does not seem to be ready soon. In order to overcome the lack of infrastructures for EUV mask inspection, we will discuss an alternative methodology which is based on wafer inspection results using DBM (Design Based Metrology) tool. It is very challenging for metrology to quantify real mask defect from wafer inspection result since various sources are possible contributor. One of them is random defect comes from poor CD uniformity. It is probable that those random defects are majority of a defect list including real mask defects. It is obvious that CD uniformity should be considered to pick out only a real mask defect. In this paper, the methodology to determine real mask defect from the wafer inspection results will be discussed. Experiments are carried out on contact layer and on metal layer using mask defect inspection tool, Teron(KLA6xx) and DBM (Design Based Metrology) tool, NGR2170™.

  5. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    Directory of Open Access Journals (Sweden)

    Yuri L. Motoyama

    2016-09-01

    Full Text Available Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK or a control group (CONT and completed five sets of chest presses and parallel squats until failure at 75% one-repetition-maximum test (1RM with 60 s of rest between sets. Ratings of perceived exertion (RPEs, blood lactate concentrations (Lac−, and total repetitions were taken after the training session. Results: MASK total repetitions were lower than those of the CONT, and (Lac− and MASK RPEs were higher than those of the CONT in both exercises. Conclusions: We conclude that an airflow-restricting mask in combination with resistance training increase perceptions of exertion and decrease muscular performance and lactate concentrations when compared to resistance training without this accessory. This evidence shows that the airflow-restricting mask may change the central nervous system and stop the exercise beforehand to prevent some biological damage.

  6. Masked areas in shear peak statistics. A forward modeling approach

    Energy Technology Data Exchange (ETDEWEB)

    Bard, D.; Kratochvil, J. M.; Dawson, W.

    2016-03-09

    The statistics of shear peaks have been shown to provide valuable cosmological information beyond the power spectrum, and will be an important constraint of models of cosmology in forthcoming astronomical surveys. Surveys include masked areas due to bright stars, bad pixels etc., which must be accounted for in producing constraints on cosmology from shear maps. We advocate a forward-modeling approach, where the impacts of masking and other survey artifacts are accounted for in the theoretical prediction of cosmological parameters, rather than correcting survey data to remove them. We use masks based on the Deep Lens Survey, and explore the impact of up to 37% of the survey area being masked on LSST and DES-scale surveys. By reconstructing maps of aperture mass the masking effect is smoothed out, resulting in up to 14% smaller statistical uncertainties compared to simply reducing the survey area by the masked area. We show that, even in the presence of large survey masks, the bias in cosmological parameter estimation produced in the forward-modeling process is ≈1%, dominated by bias caused by limited simulation volume. We also explore how this potential bias scales with survey area and evaluate how much small survey areas are impacted by the differences in cosmological structure in the data and simulated volumes, due to cosmic variance.

  7. Leak and obstruction with mask ventilation during simulated neonatal resuscitation.

    Science.gov (United States)

    Schilleman, Kim; Witlox, Ruben S; Lopriore, Enrico; Morley, Colin J; Walther, Frans J; te Pas, Arjan B

    2010-11-01

    To evaluate mask technique during simulated neonatal resuscitation and test the effectiveness of training in optimal mask handling. Seventy participants(consultants, registrars and nurses) from neonatal units were asked to administer positive pressure ventilation at a flow of 8 l/min and a frequency of 40-60/min to a modified leak free, term newborn manikin (lung compliance 0.5 ml/cm H(2)O) using a Neopuff T-piece device. Recordings were made (1) before training, (2) after training in mask handling and (3) 3 weeks later. Leak was calculated. Obstruction (tidal volume training, 10% (5-37%) directly after training and 15% (4-33%) 3 weeks later (ptraining and 3 weeks later in 46%, 42% and 37% of inflations, respectively. Severe obstruction did not occur. Mask ventilation during simulated neonatal resuscitation was often hampered by large leaks at the face mask. Moderate airway obstruction occurred frequently when effort was taken to minimise leak. Training in mask ventilation reduced mask leak but should also focus on preventing airway obstruction.

  8. GUSTATORY SYSTEM AND MASKING THE TASTE OF BITTER HERBS

    Directory of Open Access Journals (Sweden)

    Vinita Kale, Chetan Tapre and Abhay Ittadwar

    2013-11-01

    Full Text Available The oral route is the most easy and favorable route of drug administration. The development of oral formulations containing bitter herbs has widely been required in pharmaceutical and herbal industry. The human gustatory system is capable of identifying five major taste qualities: sweet, sour, salty, bitter and umami (savory. Different receptors and transduction mechanisms are involved in the detection of each taste quality. Many efforts have been focused to improve the palatability in these products that has prompted in the development of numerous techniques of taste masking. Once a method for taste masking is adopted, it becomes apparent to evaluate the effectiveness of the taste masked product. The major hurdle in evaluation of measuring the effectiveness of taste masking is that the taste is a highly subjective property and it varies demographically and with the age and gender. This communication gives a brief account of gustatory system, the receptor and transduction mechanism of bitter taste and various techniques used in taste masking of the bitters. The review also reveals the in-vitro and in-vivo methods for evaluating taste masked efficiency of developed product. Finally, the review concludes that proper choice of method for taste masking method is essential and it might depend on the properties of the herbs.

  9. Do Plant-Bound Masked Mycotoxins Contribute to Toxicity?

    Directory of Open Access Journals (Sweden)

    Silvia W. Gratz

    2017-02-01

    Full Text Available Masked mycotoxins are plant metabolites of mycotoxins which co-contaminate common cereal crops. Since their discovery, the question has arisen if they contribute to toxicity either directly or indirectly through the release of the parent mycotoxins. Research in this field is rapidly emerging and the aim of this review is to summarize the latest knowledge on the fate of masked mycotoxins upon ingestion. Fusarium mycotoxins are the most prevalent masked mycotoxins and evidence is mounting that DON3Glc and possibly other masked trichothecenes are stable in conditions prevailing in the upper gut and are not absorbed intact. DON3Glc is also not toxic per se, but is hydrolyzed by colonic microbes and further metabolized to DOM-1 in some individuals. Masked zearalenone is rather more bio-reactive with some evidence on gastric and small intestinal hydrolysis as well as hydrolysis by intestinal epithelium and components of blood. Microbial hydrolysis of ZEN14Glc is almost instantaneous and further metabolism also occurs. Identification of zearalenone metabolites and their fate in the colon are still missing as is further clarification on whether or not masked zearalenone is hydrolyzed by mammalian cells. New masked mycotoxins continuously emerge and it is crucial that we gain detailed understanding of their individual metabolic fate in the body before we can assess synergistic effects and extrapolate the additive risk of all mycotoxins present in food.

  10. Microfluidic system with integrated microinjector for automated Drosophila embryo injection.

    Science.gov (United States)

    Delubac, Daniel; Highley, Christopher B; Witzberger-Krajcovic, Melissa; Ayoob, Joseph C; Furbee, Emily C; Minden, Jonathan S; Zappe, Stefan

    2012-11-21

    Drosophila is one of the most important model organisms in biology. Knowledge derived from the recently sequenced 12 genomes of various Drosophila species can today be combined with the results of more than 100 years of research to systematically investigate Drosophila biology at the molecular level. In order to enable automated, high-throughput manipulation of Drosophila embryos, we have developed a microfluidic system based on a Pyrex-silicon-Pyrex sandwich structure with integrated, surface-micromachined silicon nitride injector for automated injection of reagents. Our system automatically retrieves embryos from an external reservoir, separates potentially clustered embryos through a sheath flow mechanisms, passively aligns an embryo with the integrated injector through geometric constraints, and pushes the embryo onto the injector through flow drag forces. Automated detection of an embryo at injection position through an external camera triggers injection of reagents and subsequent ejection of the embryo to an external reservoir. Our technology can support automated screens based on Drosophila embryos as well as creation of transgenic Drosophila lines. Apart from Drosophila embryos, the layout of our system can be easily modified to accommodate injection of oocytes, embryos, larvae, or adults of other species and fills an important technological gap with regard to automated manipulation of multicellular organisms.

  11. Simulation of AIMS measurements using rigorous mask 3D modeling

    Science.gov (United States)

    Chou, Chih-Shiang; Huang, Hsu-Ting; Chu, Fu-Sheng; Chu, Yuan-Chih; Huang, Wen-Chun; Liu, Ru-Gun; Gau, Tsai-Sheng

    2015-03-01

    Aerial image measurement system (AIMSTM) has been widely used for wafer level inspection of mask defects. Reported inspection flows include die-to-die (D2D) and die-to-database (D2DB) methods. For patterns that do not repeat in another die, only the D2DB approach is applicable. The D2DB method requires accurate simulation of AIMS measurements for a mask pattern. An optical vectorial model is needed to depict the mask diffraction effect in this simulation. To accurately simulate the imaging results, a rigorous electro-magnetic field (EMF) model is essential to correctly take account of the EMF scattering induced by the mask topography, which is usually called the mask 3D effect. In this study, the mask 3D model we use is rigorous coupled-wave analysis (RCWA), which calculates the diffraction fields from a single plane wave incidence. A hybrid Hopkins-Abbe method with RCWA is used to calculate the EMF diffraction at a desired accuracy level while keeping the computation time practical. We will compare the speed of the hybrid Hopkins-Abbe method to the rigorous Abbe method. The matching between simulation and experiment is more challenging for AIMS than CD-SEM because its measurements provide full intensity information. Parameters in the mask 3D model such as film stack thickness or film optical properties, is optimized during the fitting process. We will report the fitting results of AIMS images for twodimensional structures with various pitches. By accurately simulating the AIMS measurements, it provides a necessary tool to perform the mask inspection using the D2DB approach and to accurately predict the mask defects.

  12. Potential of mask production process for finer pattern fabrication

    Science.gov (United States)

    Yagawa, Keisuke; Ugajin, Kunihiro; Suenaga, Machiko; Kobayashi, Yoshihito; Motokawa, Takeharu; Hagihara, Kazuki; Saito, Masato; Itoh, Masamitsu

    2013-09-01

    Photomask used for optical lithography has been developed for purpose of fabrication a pattern along with finer designed rules and increase the productivity. With regard to pattern fabrication on mask, EB (Electron beam) mask writer has been used because it has high resolution beam. But in producing photomask, minimum pattern size on mask is hits a peak around 40nm by the resolution limit of ArF immersion systems. This value is easy to achieve by current EB writer. So, photomask process with EB writer has gotten attached to increase turnaround time. In next generation lithography such as EUV (Extreme ultraviolet) lithography and Nano-imprint lithography, it is enable to fabricate finer pattern beyond the resolution limit of ArF immersion systems. Thereby the pattern on a mask becomes finer rapidly. According to ITRS 2012, fabrication of finer patterns less than 20nm will be required on EUV mask and on NIL template. Especially in NIL template, less than 15nm pattern will be required half a decade later. But today's development of EB writer is aiming to increase photomask's productivity, so we will face a difficulty to fabricate finer pattern in near future. In this paper, we examined a potential of mask production process with EB writer from the view of finer pattern fabrication performances. We succeeded to fabricate hp (half-pitch) 17nm pattern on mask plate by using VSB (Variable Shaped Beam) type EB mask writer with CAR (Chemically Amplified Resist). This result suggests that the photomask fabrication process has the potential for sub-20nm generation mask production.

  13. THE CREATION AND DEVELOPMENT OF JOB IN NIGERIA: ENTREPRENEURSHIP ENLIGHTENMENT

    OpenAIRE

    Money, Udih

    2016-01-01

    This paper is an opinion one that examined the significant role of entrepreneurship enlightenment in the creation and development of job in Nigeria. Entrepreneurship enlightenment that is continuous and reaching the citizens will help in the creation and development of job. It is viewed that entrepreneurship enlightenment is a giant stride towards creation and development of job in Nigeria. This paper also touches the challenges facing entrepreneurship development and job creation in Nigeria....

  14. The potential of shared value creation: a theoretical analysis

    OpenAIRE

    Victor Danciu

    2016-01-01

    The urgent issues economy, environment and society are facing need new approaches which allow a well-balanced sharing of value created by the economy. A step forward is the concept of shared value creation. This paper aims to analyze the main features, the content of strategy of shared value creation and to propose the social innovation as main strategic way of shared value creation. At the beginning, the drivers and challenges of shared value creation are investigated in a systematized manne...

  15. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin D.; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    It has been suggested that the level dependence of the upper masking slopebe utilised in perceptual models in bit-rate reduction systems. However,comodulation masking release (CMR) phenomena lead to a reduction of themasking effect when a masker and a probe signal are amplitude modulated withthe...... same frequency. In bit-rate reduction systems the masker would be theaudio signal and the probe signal would represent the quantization noise.Masking curves have been determined for sinusoids and 1-Bark-wide noisemaskers in order to investigate the risk of CMR, when quantizing depths arefixed...

  16. Automated Computer Access Request System

    Science.gov (United States)

    Snook, Bryan E.

    2010-01-01

    The Automated Computer Access Request (AutoCAR) system is a Web-based account provisioning application that replaces the time-consuming paper-based computer-access request process at Johnson Space Center (JSC). Auto- CAR combines rules-based and role-based functionality in one application to provide a centralized system that is easily and widely accessible. The system features a work-flow engine that facilitates request routing, a user registration directory containing contact information and user metadata, an access request submission and tracking process, and a system administrator account management component. This provides full, end-to-end disposition approval chain accountability from the moment a request is submitted. By blending both rules-based and rolebased functionality, AutoCAR has the flexibility to route requests based on a user s nationality, JSC affiliation status, and other export-control requirements, while ensuring a user s request is addressed by either a primary or backup approver. All user accounts that are tracked in AutoCAR are recorded and mapped to the native operating system schema on the target platform where user accounts reside. This allows for future extensibility for supporting creation, deletion, and account management directly on the target platforms by way of AutoCAR. The system s directory-based lookup and day-today change analysis of directory information determines personnel moves, deletions, and additions, and automatically notifies a user via e-mail to revalidate his/her account access as a result of such changes. AutoCAR is a Microsoft classic active server page (ASP) application hosted on a Microsoft Internet Information Server (IIS).

  17. Creative participation: collective sentiment in online co-creation communities

    NARCIS (Netherlands)

    Lee, H.H.M.; van Dolen, W.

    2015-01-01

    Co-creation communities allow companies to utilize consumers’ creative thinking in the innovation process. This paper seeks to understand the role of sentiment in user co-creation. The results suggest that management style can affect the success of co-creation communities. Specific employees’ commun

  18. Creative participation: collective sentiment in online co-creation communities

    NARCIS (Netherlands)

    Lee, H.H.M.; van Dolen, W.

    2015-01-01

    Co-creation communities allow companies to utilize consumers’ creative thinking in the innovation process. This paper seeks to understand the role of sentiment in user co-creation. The results suggest that management style can affect the success of co-creation communities. Specific employees’

  19. Rheumatic masks of plasma cell dyscrasias

    Directory of Open Access Journals (Sweden)

    Vladimir Ivanovich Vasilyev

    2012-01-01

    Full Text Available Objective: to consider clinical practice problems in the differential diagnosis of different types of plasma cell dyscrasias (PCD. Subjects and methods. Fourteen patients (8 men and 6 women aged 52±12 years, in whom rheumatic diseases (RD were ruled out and who were diagnosed as having primary PCD: different types of myeloma in 7 patients, myeloma + AL-amyloidosis in 2, AL-amyloidosis in 3, and Waldenstrom’s macroglobulinemia in 2, were examined. Results and discussion. The most common maldiagnosed RDs in patients with PCD were seronegative rheumatoid arthritis (RA, systemic lupus erythematosus, Sjogren’s disease, and different forms of vasculitis. The most frequent masks of RD were kidney (78% and osteoarticular system (64% lesions, vascular disorders (36%, peripheral polyneuropathies (36%, and enlarged salivary glands with xerostomia (28.5%. Serum and urine immunochemical study should be performed in all patients who have clinical manifestations of seropositive RA, spondyloarthritis, intensive bone pain syndrome, ulceronecrotic vasculitis, enlarged submandibular salivary glands with macroglossia in the absence of markers of autoimmune disease for the timely diagnosis of PCD and the exclusion of RD. The paper estimates the sensitivity and specificity of main methods used to diagnose different types of PCD.

  20. Surround-Masking Affects Visual Estimation Ability

    Science.gov (United States)

    Jastrzebski, Nicola R.; Hugrass, Laila E.; Crewther, Sheila G.; Crewther, David P.

    2017-01-01

    Visual estimation of numerosity involves the discrimination of magnitude between two distributions or perceptual sets that vary in number of elements. How performance on such estimation depends on peripheral sensory stimulation is unclear, even in typically developing adults. Here, we varied the central and surround contrast of stimuli that comprised a visual estimation task in order to determine whether mechanisms involved with the removal of unessential visual input functionally contributes toward number acuity. The visual estimation judgments of typically developed adults were significantly impaired for high but not low contrast surround stimulus conditions. The center and surround contrasts of the stimuli also differentially affected the accuracy of numerosity estimation depending on whether fewer or more dots were presented. Remarkably, observers demonstrated the highest mean percentage accuracy across stimulus conditions in the discrimination of more elements when the surround contrast was low and the background luminance of the central region containing the elements was dark (black center). Conversely, accuracy was severely impaired during the discrimination of fewer elements when the surround contrast was high and the background luminance of the central region was mid level (gray center). These findings suggest that estimation ability is functionally related to the quality of low-order filtration of unessential visual information. These surround masking results may help understanding of the poor visual estimation ability commonly observed in developmental dyscalculia.