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Sample records for atomic layer epitaxy

  1. Atomic layer epitaxy

    Science.gov (United States)

    Goodman, Colin H. L.; Pessa, Markus V.

    1986-08-01

    Atomic layer epitaxy (ALE) is not so much a new technique for the preparation of thin films as a novel modification to existing methods of vapor-phase epitaxy, whether physical [e.g., evaporation, at one limit molecular-beam epitaxy (MBE)] or chemical [e.g., chloride epitaxy or metalorganic chemical vapor deposition (MOCVD)]. It is a self-regulatory process which, in its simplest form, produces one complete molecular layer of a compound per operational cycle, with a greater thickness being obtained by repeated cycling. There is no growth rate in ALE as in other crystal growth processes. So far ALE has been applied to rather few materials, but, in principle, it could have a quite general application. It has been used to prepare single-crystal overlayers of CdTe, (Cd,Mn)Te, GaAs and AlAs, a number of polycrystalline films and highly efficient electroluminescent thin-film displays based on ZnS:Mn. It could also offer particular advantages for the preparation of ultrathin films of precisely controlled thickness in the nanometer range and thus may have a special value for growing low-dimensional structures.

  2. Photoenhanced atomic layer epitaxy. Hikari reiki genshiso epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Mashita, M.; Kawakyu, Y. (Toshiba corp., Tokyo (Japan))

    1991-10-01

    The growth temperature range was greatly expanded of atomic layer epitaxy (ALE) expected as the growth process of ultra-thin stacks. Ga layers and As layers were formed one after the other on a GaAs substrate in the atmosphere of trimethylgallium (TMG) or AsH{sub 2} supplied alternately, by KrF excimer laser irradiation normal to the substrate. As a result, the growth temperature range was 460-540{degree}C nearly 10 times that of 500 {plus minus} several degrees centigrade in conventional thermal growth method. Based on the experimental result where light absorption of source molecules adsorbed on a substrate surface was larger than that under gaseous phase condition, new adsorbed layer enhancement model was proposed to explain above irradiation effect verifying it by experiments. As this photoenhancement technique is applied to other materials, possible fabrication of new crystal structures as a super lattice with ultra-thin stacks of single atomic layers is expected because of a larger freedom in material combination for hetero-ALE. 11 refs., 7 figs.

  3. Highly conductive epitaxial ZnO layers deposited by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Baji, Zs., E-mail: baji.zsofia@ttk.mta.hu [Research Centre for Natural Sciences Institute for Technical Physics and Materials Science, Konkoly Thege M. út 29-33, H-1121 Budapest (Hungary); Lábadi, Z.; Molnár, Gy.; Pécz, B. [Research Centre for Natural Sciences Institute for Technical Physics and Materials Science, Konkoly Thege M. út 29-33, H-1121 Budapest (Hungary); Vad, K. [Institute of Nuclear Research of the Hungarian Academy of Sciences (ATOMKI), P.O. Box 51, H-4001, Debrecen (Hungary); Horváth, Z.E. [Research Centre for Natural Sciences Institute for Technical Physics and Materials Science, Konkoly Thege M. út 29-33, H-1121 Budapest (Hungary); Szabó, P.J. [Budapest University of Technology and Economics, Műegyetem rkp. 3-9. H-1111 Budapest (Hungary); Nagata, T. [International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044 (Japan); Volk, J. [Research Centre for Natural Sciences Institute for Technical Physics and Materials Science, Konkoly Thege M. út 29-33, H-1121 Budapest (Hungary)

    2014-07-01

    The possibility of depositing conductive epitaxial layers with atomic layer deposition has been examined. Epitaxial ZnO layers were grown on GaN and doped with Al. The resistivity of the epitaxial layers is between 0.6 and 2 * 10{sup −4} Ω cm with both the mobilities and the carrier concentrations being very high. The source of the high carrier concentration was found to be a combination of Al and Ga doping, the latter resulted by Ga atoms diffusing into the ZnO from the GaN substrate. - Highlights: • High-quality epitaxial ZnO layers were deposited with ALD on GaN above 270 °C. • In the Al-doped layers, domains with different orientations also appear. • Lower-temperature epitaxy is possible with an epitaxial seed layer. • The conductivity of the epitaxial layers is between 0.6 and 2 * 10{sup −4} Ω cm. • The high carrier concentration is resulted by the Ga and Al doping.

  4. Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Nepal, N.; Qadri, S. B.; Hite, J. K.; Mahadik, N. A.; Mastro, M. A.; Eddy, C. R. Jr. [U.S. Naval Research Laboratory, Washington, DC 20375 (United States)

    2013-08-19

    Thin AlN layers were grown at 200–650 °C by plasma assisted atomic layer epitaxy (PA-ALE) simultaneously on Si(111), sapphire (1120), and GaN/sapphire substrates. The AlN growth on Si(111) is self-limited for trimethyaluminum (TMA) pulse of length > 0.04 s, using a 10 s purge. However, the AlN nucleation on GaN/sapphire is non-uniform and has a bimodal island size distribution for TMA pulse of ≤0.03 s. The growth rate (GR) remains almost constant for T{sub g} between 300 and 400 °C indicating ALE mode at those temperatures. The GR is increased by 20% at T{sub g} = 500 °C. Spectroscopic ellipsometry (SE) measurement shows that the ALE AlN layers grown at T{sub g} ≤ 400 °C have no clear band edge related features, however, the theoretically estimated band gap of 6.2 eV was measured for AlN grown at T{sub g} ≥ 500 °C. X-ray diffraction measurements on 37 nm thick AlN films grown at optimized growth conditions (T{sub g} = 500 °C, 10 s purge, 0.06 s TMA pulse) reveal that the ALE AlN on GaN/sapphire is (0002) oriented with rocking curve full width at the half maximum (FWHM) of 670 arc sec. Epitaxial growth of crystalline AlN layers by PA-ALE at low temperatures broadens application of the material in the technologies that require large area conformal growth at low temperatures with thickness control at the atomic scale.

  5. Growth mechanisms for Si epitaxy on O atomic layers: Impact of O-content and surface structure

    Science.gov (United States)

    Jayachandran, Suseendran; Billen, Arne; Douhard, Bastien; Conard, Thierry; Meersschaut, Johan; Moussa, Alain; Caymax, Matty; Bender, Hugo; Vandervorst, Wilfried; Heyns, Marc; Delabie, Annelies

    2016-10-01

    The epitaxial growth of Si layers on Si substrates in the presence of O atoms is generally considered a challenge, as O atoms degrade the epitaxial quality by generating defects. Here, we investigate the growth mechanisms for Si epitaxy on O atomic layers (ALs) with different O-contents and structures. O ALs are deposited by ozone (O3) or oxygen (O2) exposure on H-terminated Si at 50 °C and 300 °C respectively. Epitaxial Si is deposited by chemical vapor deposition using silane (SiH4) at 500 °C. After O3 exposure, the O atoms are uniformly distributed in Si-Si dimer/back bonds. This O layer still allows epitaxial seeding of Si. The epitaxial quality is enhanced by lowering the surface distortions due to O atoms and by decreasing the arrival rate of SiH4 reactants, allowing more time for surface diffusion. After O2 exposure, the O atoms are present in the form of SiOx clusters. Regions of hydrogen-terminated Si remain present between the SiOx clusters. The epitaxial seeding of Si in these structures is realized on H-Si regions, and an epitaxial layer grows by a lateral overgrowth mechanism. A breakdown in the epitaxial ordering occurs at a critical Si thickness, presumably by accumulation of surface roughness.

  6. Atomic layer epitaxy of hematite on indium tin oxide for application in solar energy conversion

    Energy Technology Data Exchange (ETDEWEB)

    Martinson, Alex B.; Riha, Shannon; Guo, Peijun; Emery, Jonathan D.

    2016-07-12

    A method to provide an article of manufacture of iron oxide on indium tin oxide for solar energy conversion. An atomic layer epitaxy method is used to deposit an uncommon bixbytite-phase iron (III) oxide (.beta.-Fe.sub.2O.sub.3) which is deposited at low temperatures to provide 99% phase pure .beta.-Fe.sub.2O.sub.3 thin films on indium tin oxide. Subsequent annealing produces pure .alpha.-Fe.sub.2O.sub.3 with well-defined epitaxy via a topotactic transition. These highly crystalline films in the ultra thin film limit enable high efficiency photoelectrochemical chemical water splitting.

  7. Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization

    Energy Technology Data Exchange (ETDEWEB)

    Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A., E-mail: bparkin1@uwyo.edu [Department of Chemistry, School of Energy Resources, University of Wyoming, Laramie, Wyoming 82071 (United States)

    2015-01-15

    Atomic layer deposition was used to grow epitaxial layers of anatase (001) TiO{sub 2} on the surface of SrTiO{sub 3} (100) crystals with a 3% lattice mismatch. The epilayers grow as anatase (001) as confirmed by x-ray diffraction. Atomic force microscope images of deposited films showed epitaxial layer-by-layer growth up to about 10 nm, whereas thicker films, of up to 32 nm, revealed the formation of 2–5 nm anatase nanocrystallites oriented in the (001) direction. The anatase epilayers were used as substrates for dye sensitization. The as received strontium titanate crystal was not sensitized with a ruthenium-based dye (N3) or a thiacyanine dye (G15); however, photocurrent from excited state electron injection from these dyes was observed when adsorbed on the anatase epilayers. These results show that highly ordered anatase surfaces can be grown on an easily obtained substrate crystal.

  8. Conditions for the deposition of CdTe by electrochemical atomic layer epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Gregory, B.W.; Suggs, D.W.; Stickney, J.L. (School of Chemical Sciences, Univ. of Georgia, Athens, GA (US))

    1991-05-01

    In this paper the method of electrochemical atomic layer epitaxy (ECALE) is described. It involves the alternated electrochemical deposition of atomic layers of elements to form compound semiconductors. It is being investigated as a method for forming epitaxial thin films. Presently, it appears that the method is applicable to a wide range of compound semiconductors composed of a metal and one of the following main group elements: S, Se, Te, As, Sb, or Br. Initial studies have involved CdTe deposition. Factors controlling deposit structure and composition are discussed here. Preliminary results which show that ordered electrodeposits of CdTe can be formed by the ECALE method are also presented. Results reported here were obtained with both a polycrystalline Au thin-layer electrochemical cell and a single-crystal Au electrode with faces oriented to the (111), (110), and (100) planes. The single-crystal electrode was contained in a UHV surface analysis instrument with an integral electrochemical cell. Deposits were examined without their exposure to air using LEED and Auger electron spectroscopy. Coverages were determined using coulometry in the thin-layer electrochemical cell.

  9. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors

    Energy Technology Data Exchange (ETDEWEB)

    McDaniel, Martin D.; Ngo, Thong Q.; Hu, Shen; Ekerdt, John G., E-mail: ekerdt@utexas.edu [Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712 (United States); Posadas, Agham; Demkov, Alexander A. [Department of Physics, The University of Texas at Austin, Austin, Texas 78712 (United States)

    2015-12-15

    Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide thin films with nanoscale thickness control. Most successful industrial applications have been with binary oxides, such as Al{sub 2}O{sub 3} and HfO{sub 2}. However, there has been much effort to deposit ternary oxides, such as perovskites (ABO{sub 3}), with desirable properties for advanced thin film applications. Distinct challenges are presented by the deposition of multi-component oxides using ALD. This review is intended to highlight the research of the many groups that have deposited perovskite oxides by ALD methods. Several commonalities between the studies are discussed. Special emphasis is put on precursor selection, deposition temperatures, and specific property performance (high-k, ferroelectric, ferromagnetic, etc.). Finally, the monolithic integration of perovskite oxides with semiconductors by ALD is reviewed. High-quality epitaxial growth of oxide thin films has traditionally been limited to physical vapor deposition techniques (e.g., molecular beam epitaxy). However, recent studies have demonstrated that epitaxial oxide thin films may be deposited on semiconductor substrates using ALD. This presents an exciting opportunity to integrate functional perovskite oxides for advanced semiconductor applications in a process that is economical and scalable.

  10. Atomic layer deposition of metastable β-Fe₂O₃ via isomorphic epitaxy for photoassisted water oxidation.

    Science.gov (United States)

    Emery, Jonathan D; Schlepütz, Christian M; Guo, Peijun; Riha, Shannon C; Chang, Robert P H; Martinson, Alex B F

    2014-12-24

    We report the growth and photoelectrochemical (PEC) characterization of the uncommon bibyite phase of iron(III) oxide (β-Fe2O3) epitaxially stabilized via atomic layer deposition on an conductive, transparent, and isomorphic template (Sn-doped In2O3). As a photoanode, unoptimized β-Fe2O3 ultrathin films perform similarly to their ubiquitous α-phase (hematite) counterpart, but reveal a more ideal bandgap (1.8 eV), a ∼0.1 V improved photocurrent onset potential, and longer wavelength (>600 nm) spectral response. Stable operation under basic water oxidation justifies further exploration of this atypical phase and motivates the investigation of other unexplored metastable phases as new PEC materials.

  11. Electrochemical removal of hydrogen atoms in Mg-doped GaN epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Lee, June Key, E-mail: junekey@jnu.ac.kr, E-mail: hskim7@jbnu.ac.kr; Hyeon, Gil Yong; Tawfik, Wael Z.; Choi, Hee Seok [Department of Materials Science and Engineering, and Optoelectronics Convergence Research Center, Chonnam National University, Gwangju 500-757 (Korea, Republic of); Ryu, Sang-Wan [Department of Physics and Optoelectronics Convergence Research Center, Chonnam National University, Gwangju 500-757 (Korea, Republic of); Jeong, Tak [Korea Photonics Technology Institute, Gwangju 500-460 (Korea, Republic of); Jung, Eunjin; Kim, Hyunsoo, E-mail: junekey@jnu.ac.kr, E-mail: hskim7@jbnu.ac.kr [School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756 (Korea, Republic of)

    2015-05-14

    Hydrogen atoms inside of an Mg-doped GaN epitaxial layer were effectively removed by the electrochemical potentiostatic activation (EPA) method. The role of hydrogen was investigated in terms of the device performance of light-emitting diodes (LEDs). The effect of the main process parameters for EPA such as solution type, voltage, and time was studied and optimized for application to LED fabrication. In optimized conditions, the light output of 385-nm LEDs was improved by about 26% at 30 mA, which was caused by the reduction of the hydrogen concentration by ∼35%. Further removal of hydrogen seems to be involved in the breaking of Ga-H bonds that passivate the nitrogen vacancies. An EPA process with high voltage breaks not only Mg-H bonds that generate hole carriers but also Ga-H bonds that generate electron carriers, thus causing compensation that impedes the practical increase of hole concentration, regardless of the drastic removal of hydrogen atoms. A decrease in hydrogen concentration affects the current-voltage characteristics, reducing the reverse current by about one order and altering the forward current behavior in the low voltage region.

  12. Electrochemical removal of hydrogen atoms in Mg-doped GaN epitaxial layers

    International Nuclear Information System (INIS)

    Hydrogen atoms inside of an Mg-doped GaN epitaxial layer were effectively removed by the electrochemical potentiostatic activation (EPA) method. The role of hydrogen was investigated in terms of the device performance of light-emitting diodes (LEDs). The effect of the main process parameters for EPA such as solution type, voltage, and time was studied and optimized for application to LED fabrication. In optimized conditions, the light output of 385-nm LEDs was improved by about 26% at 30 mA, which was caused by the reduction of the hydrogen concentration by ∼35%. Further removal of hydrogen seems to be involved in the breaking of Ga-H bonds that passivate the nitrogen vacancies. An EPA process with high voltage breaks not only Mg-H bonds that generate hole carriers but also Ga-H bonds that generate electron carriers, thus causing compensation that impedes the practical increase of hole concentration, regardless of the drastic removal of hydrogen atoms. A decrease in hydrogen concentration affects the current-voltage characteristics, reducing the reverse current by about one order and altering the forward current behavior in the low voltage region

  13. Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Nepal, Neeraj; Anderson, Virginia R.; Hite, Jennifer K.; Eddy, Charles R.

    2015-08-31

    We report the growth and characterization of III-nitride ternary thin films (Al{sub x}Ga{sub 1−x}N, In{sub x}Al{sub 1−x}N and In{sub x}Ga{sub 1−x}N) at ≤ 500 °C by plasma assisted atomic layer epitaxy (PA-ALE) over a wide stoichiometric range including the range where phase separation has been an issue for films grown by molecular beam epitaxy and metal organic chemical vapor deposition. The composition of these ternaries was intentionally varied through alterations in the cycle ratios of the III-nitride binary layers (AlN, GaN, and InN). By this digital alloy growth method, we are able to grow III-nitride ternaries by PA-ALE over nearly the entire stoichiometry range including in the spinodal decomposition region (x = 15–85%). These early efforts suggest great promise of PA-ALE at low temperatures for addressing miscibility gap challenges encountered with conventional growth methods and realizing high performance optoelectronic and electronic devices involving ternary/binary heterojunctions, which are not currently possible. - Highlights: • III-N ternaries grown at ≤ 500 °C by plasma assisted atomic layer epitaxy • Growth of InGaN and AlInN in the spinodal decomposition region (15–85%) • Epitaxial, smooth and uniform III-N film growth at low temperatures.

  14. Epitaxial growth of zinc oxide by the method of atomic layer deposition on SiC/Si substrates

    Science.gov (United States)

    Kukushkin, S. A.; Osipov, A. V.; Romanychev, A. I.

    2016-07-01

    For the first time, zinc oxide epitaxial films on silicon were grown by the method of atomic layer deposition at a temperature T = 250°C. In order to avoid a chemical reaction between silicon and zinc oxide (at the growth temperature, the rate constant of the reaction is of the order of 1022), a high-quality silicon carbide buffer layer with a thickness of ~50 nm was preliminarily synthesized by the chemical substitution of atoms on the silicon surface. The zinc oxide films were grown on n- and p-type Si(100) wafers. The ellipsometric, Raman, electron diffraction, and trace element analyses showed that the ZnO films are epitaxial.

  15. Determination of the types and densities of dislocations in GaN epitaxial layers of different thicknesses by optical and atomic force microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Kravchuk, K. S. [Moscow State Institute of Steel and Alloys (Russian Federation); Mezhennyi, M. V. [Institute of Chemical Problems for Microelectronics (Russian Federation); Yugova, T. G., E-mail: p_Yugov@mail.ru [Institute of Rare Metals (Russian Federation)

    2012-03-15

    The change in the dislocation density on the surface of GaN epitaxial layers, which were grown by hydride vapor-phase epitaxy on sapphire substrates with c and r orientations, has been investigated by optical and atomic force microscopy (AFM). It is shown that the observed decrease in the density of threading dislocations with an increase in the layer thickness is related to the annihilation of mixed dislocations. The experimental and theoretical data on the change in the density of mixed dislocations with an increase in the epitaxial-layer thickness are in good correspondence.

  16. Growth of bismuth telluride thin film on Pt by electrochemical atomic layer epitaxy

    Institute of Scientific and Technical Information of China (English)

    ZHU Wen; YANG Jun-you; GAO Xian-hui; HOU Jie; ZHANG Tong-jun; CUI Kun

    2005-01-01

    An automated thin-layer flow cell electrodeposition system was developed for growing Bi2 Te3 thin film by ECALE. The dependence of the Bi and Te deposition potentials on Pt electrode was studied. In the first attempt,this reductive Te underpotential deposition (UPD)/reductive Bi UPD cycle was performed to 100 layers. A better linearity of the stripping charge with the number of cycles has been shown and confirmed a layer-by-layer growth mode, which is consistent with an epitaxial growth. The 4: 3 stoichiometric ratio of Bi to Te suggests that the incomplete charge transfer in HTeO2+ reduction excludes the possibility of Bi2 Te3 formation. X-ray photoelectron spectroscopy (XPS) analysis also reveals that the incomplete charge transfer in HTeO2+ occurs in Te direct deposition. The effective way of depositing Bi2 Te3 on Pt consists in oxidative Te UPD and reductive Bi UPD. The thin film deposited by this procedure was characterized by X-ray diffraction(XRD), scanning electron microscopy(SEM) and X-ray photoelectron spectroscopy(XPS). A polycrystalline characteristic was confirmed by XRD. The 2 : 3 stoichiometric ratio was confirmed by XPS. The SEM image indicates that the deposit looks like a series of buttons about 0.3 - 0.4 μm in diameter, which is corresponding with calculated thickness of the epitaxial film. This suggests that the particle growth appears to be linear with the number of cycles, as it is consistent with a layer by layer growth mode.

  17. Epitaxial TiO 2/SnO 2 core-shell heterostructure by atomic layer deposition

    KAUST Repository

    Nie, Anmin

    2012-01-01

    Taking TiO 2/SnO 2 core-shell nanowires (NWs) as a model system, we systematically investigate the structure and the morphological evolution of this heterostructure synthesized by atomic layer deposition/epitaxy (ALD/ALE). All characterizations, by X-ray diffraction, high-resolution transmission electron microscopy, selected area electron diffraction and Raman spectra, reveal that single crystalline rutile TiO 2 shells can be epitaxially grown on SnO 2 NWs with an atomically sharp interface at low temperature (250 °C). The growth behavior of the TiO 2 shells highly depends on the surface orientations and the geometrical shape of the core SnO 2 NW cross-section. Atomically smooth surfaces are found for growth on the {110} surface. Rough surfaces develop on {100} surfaces due to (100) - (1 × 3) reconstruction, by introducing steps in the [010] direction as a continuation of {110} facets. Lattice mismatch induces superlattice structures in the TiO 2 shell and misfit dislocations along the interface. Conformal epitaxial growth has been observed for SnO 2 NW cores with an octagonal cross-section ({100} and {110} surfaces). However, for a rectangular core ({101} and {010} surfaces), the shell also derives an octagonal shape from the epitaxial growth, which was explained by a proposed model based on ALD kinetics. The surface steps and defects induced by the lattice mismatch likely lead to improved photoluminescence (PL) performance for the yellow emission. Compared to the pure SnO 2 NWs, the PL spectrum of the core-shell nanostructures exhibits a stronger emission peak, which suggests potential applications in optoelectronics. © The Royal Society of Chemistry 2012.

  18. Atomic Layer Epitaxy of h-BN(0001) Multilayers on Co(0001) and Molecular Beam Epitaxy Growth of Graphene on h-BN(0001)/Co(0001).

    Science.gov (United States)

    Driver, M Sky; Beatty, John D; Olanipekun, Opeyemi; Reid, Kimberly; Rath, Ashutosh; Voyles, Paul M; Kelber, Jeffry A

    2016-03-22

    The direct growth of hexagonal boron nitride (h-BN) by industrially scalable methods is of broad interest for spintronic and nanoelectronic device applications. Such applications often require atomically precise control of film thickness and azimuthal registry between layers and substrate. We report the formation, by atomic layer epitaxy (ALE), of multilayer h-BN(0001) films (up to 7 monolayers) on Co(0001). The ALE process employs BCl3/NH3 cycles at 600 K substrate temperature. X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED) data show that this process yields an increase in h-BN average film thickness linearly proportional to the number of BCl3/NH3 cycles, with BN layers in azimuthal registry with each other and with the Co(0001) substrate. LEED diffraction spot profile data indicate an average BN domain size of at least 1900 Å. Optical microscopy data indicate the presence of some domains as large as ∼20 μm. Transmission electron microscopy (TEM) and ambient exposure studies demonstrate macroscopic and microscopic continuity of the h-BN film, with the h-BN film highly conformal to the Co substrate. Photoemission data show that the h-BN(0001) film is p-type, with band bending near the Co/h-BN interface. Growth of graphene by molecular beam epitaxy (MBE) is observed on the surface of multilayer h-BN(0001) at temperatures of 800 K. LEED data indicate azimuthal graphene alignment with the h-BN and Co(0001) lattices, with domain size similar to BN. The evidence of multilayer BN and graphene azimuthal alignment with the lattice of the Co(0001) substrate demonstrates that this procedure is suitable for scalable production of heterojunctions for spintronic applications. PMID:26940024

  19. Photo-irradiation effects on GaAs atomic layer epitaxial growth. GaAs no genshiso epitaxial seicho ni okeru hikari reiki koka

    Energy Technology Data Exchange (ETDEWEB)

    Mashita, M.; Kawakyu, Y.; Sasaki, M.; Ishikawa, H. (Toshiba Corp., Kawasaki (Japan). Research and Development Center)

    1990-08-10

    Single atomic layer epitaxy (ALE) aims at controlling a growing film at a precision of single molecular layer. In this article, it is reported that the growth temperature range of ALE was expanded by the vertical irradiation of KrF exima laser (248 nm) onto the substrate for the ALE growth of GaAs using the metalorganic chemical vapor deposition (MOCVD) method. Thanks for the results of the above experiment, it was demonstrated that the irradiation effect was not thermal, but photochemical. In addition, this article studies the possibility of adsorption layer irradiation and surface irradiation as the photo-irradiation mechanism, and points out that coexistence of both irradiation mechanisms can be considered and, in case of exima laser, strong possibility of direct irradiation of the adsorption layer because of its high power density. Hereinafter, by using both optical growth ALE and thermal growth ALE jointly, the degree of freedom of combination of hetero ALE increases and its application to various material systems becomes possible. 16 refs., 6 figs.

  20. Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

    Energy Technology Data Exchange (ETDEWEB)

    Acharya, Ananta R., E-mail: aacharya@georgiasouthern.edu, E-mail: anantaach@gmail.com [Department of Physics, Georgia Southern University, Statesboro, Georgia 30460 (United States); Thoms, Brian D. [Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303 (United States); Nepal, Neeraj [American Association for Engineering Education, 1818 N Street NW, Washington, DC 20034 (United States); Eddy, Charles R. [Electronics Science and Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375 (United States)

    2015-03-15

    The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.

  1. Observation of different reflected high-energy electron diffraction patterns during atomic layer epitaxy growth of CdTe epilayers

    Science.gov (United States)

    Faschinger, W.; Juza, P.; Sitter, H.

    1991-12-01

    We present the first RHEED observations during atomic layer epitaxy growth of CdTe on GaAs substrates. The evolution of the RHEED pattern shows that, despite the large lattice mismatch, growth becomes two-dimensional after the deposition of a few monolayers. We observe intensity variations of two RHEED spots under surface resonance conditions and show that this new approach is superior to the observation of the specular spot for the measurement of surface coverages and adsorption kinetics. From the variation of the spot intensities with substrate temperature, we deduce that the Cd and Te surface coverages drop to 0.5 at substrate temperatures higher than 315°C.

  2. Energy band alignment of atomic layer deposited HfO2 oxide film on epitaxial (100)Ge, (110)Ge, and (111)Ge layers

    International Nuclear Information System (INIS)

    Crystallographically oriented epitaxial Ge layers were grown on (100), (110), and (111)A GaAs substrates by in situ growth process using two separate molecular beam epitaxy chambers. The band alignment properties of atomic layer hafnium oxide (HfO2) film deposited on crystallographically oriented epitaxial Ge were investigated using x-ray photoelectron spectroscopy (XPS). Valence band offset, ΔEv values of HfO2 relative to (100)Ge, (110)Ge, and (111)Ge orientations were 2.8 eV, 2.28 eV, and 2.5 eV, respectively. Using XPS data, variation in valence band offset, ΔEV(100)Ge>ΔEV(111)Ge>ΔEV(110)Ge, was obtained related to Ge orientation. Also, the conduction band offset, ΔEc relation, ΔEc(110)Ge>ΔEc(111)Ge>ΔEc(100)Ge related to Ge orientations was obtained using the measured bandgap of HfO2 on each orientation and with the Ge bandgap of 0.67 eV. These band offset parameters for carrier confinement would offer an important guidance to design Ge-based p- and n-channel metal-oxide field-effect transistor for low-power application.

  3. Seeding Atomic Layer Deposition of High-k Dielectrics on Epitaxial Graphene with Organic Self-assembled Monolayers

    Energy Technology Data Exchange (ETDEWEB)

    Alaboson, Justice M. P.; Wang, Qing Hua; Emery, J.D.; Lipson, Albert L; Bedzyk, M.J.; Elam, Jeffrey W.; Pellin, Michael J.; Hersam, Mark C.

    2011-06-28

    The development of high-performance graphene-based nanoelectronics requires the integration of ultrathin and pinhole-free high-k dielectric films with graphene at the wafer scale. Here, we demonstrate that self-assembled monolayers of perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) act as effective organic seeding layers for atomic layer deposition (ALD) of HfO₂ and Al₂O₃ on epitaxial graphene on SiC(0001). The PTCDA is deposited via sublimation in ultrahigh vacuum and shown to be highly ordered with low defect density by molecular-resolution scanning tunneling microscopy. Whereas identical ALD conditions lead to incomplete and rough dielectric deposition on bare graphene, the chemical functionality provided by the PTCDA seeding layer yields highly uniform and conformal films. The morphology and chemistry of the dielectric films are characterized by atomic force microscopy, ellipsometry, cross-sectional scanning electron microscopy, and X-ray photoelectron spectroscopy, while high-resolution X-ray reflectivity measurements indicate that the underlying graphene remains intact following ALD. Using the PTCDA seeding layer, metal-oxide-graphene capacitors fabricated with a 3 nm Al₂O₃ and 10 nm HfO₂ dielectric stack show high capacitance values of ~700 nF/cm² and low leakage currents of ~5 × 10{sup –9} A/cm² at 1 V applied bias. These results demonstrate the viability of sublimated organic self-assembled monolayers as seeding layers for high-k dielectric films in graphene-based nanoelectronics.

  4. Seeding atomic layer deposition of high-k dielectrics on epitaxial graphene with organic self-assembled monolayers.

    Science.gov (United States)

    Alaboson, Justice M P; Wang, Qing Hua; Emery, Jonathan D; Lipson, Albert L; Bedzyk, Michael J; Elam, Jeffrey W; Pellin, Michael J; Hersam, Mark C

    2011-06-28

    The development of high-performance graphene-based nanoelectronics requires the integration of ultrathin and pinhole-free high-k dielectric films with graphene at the wafer scale. Here, we demonstrate that self-assembled monolayers of perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) act as effective organic seeding layers for atomic layer deposition (ALD) of HfO(2) and Al(2)O(3) on epitaxial graphene on SiC(0001). The PTCDA is deposited via sublimation in ultrahigh vacuum and shown to be highly ordered with low defect density by molecular-resolution scanning tunneling microscopy. Whereas identical ALD conditions lead to incomplete and rough dielectric deposition on bare graphene, the chemical functionality provided by the PTCDA seeding layer yields highly uniform and conformal films. The morphology and chemistry of the dielectric films are characterized by atomic force microscopy, ellipsometry, cross-sectional scanning electron microscopy, and X-ray photoelectron spectroscopy, while high-resolution X-ray reflectivity measurements indicate that the underlying graphene remains intact following ALD. Using the PTCDA seeding layer, metal-oxide-graphene capacitors fabricated with a 3 nm Al(2)O(3) and 10 nm HfO(2) dielectric stack show high capacitance values of ∼700 nF/cm(2) and low leakage currents of ∼5 × 10(-9) A/cm(2) at 1 V applied bias. These results demonstrate the viability of sublimated organic self-assembled monolayers as seeding layers for high-k dielectric films in graphene-based nanoelectronics. PMID:21553842

  5. Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition.

    Science.gov (United States)

    Lin, Edward L; Edmondson, Bryce I; Hu, Shen; Ekerdt, John G

    2016-01-01

    Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potential for next-generation electronic materials, but to-date have mostly been deposited by physical methods. This work outlines a method for depositing SrTiO3 (STO) on germanium using ALD. Germanium has higher carrier mobilities than silicon and therefore offers an alternative semiconductor material with faster device operation. This method takes advantage of the instability of germanium's native oxide by using thermal deoxidation to clean and reconstruct the Ge (001) surface to the 2×1 structure. 2-nm thick, amorphous STO is then deposited by ALD. The STO film is annealed under ultra-high vacuum and crystallizes on the reconstructed Ge surface. Reflection high-energy electron diffraction (RHEED) is used during this annealing step to monitor the STO crystallization. The thin, crystalline layer of STO acts as a template for subsequent growth of STO that is crystalline as-grown, as confirmed by RHEED. In situ X-ray photoelectron spectroscopy is used to verify film stoichiometry before and after the annealing step, as well as after subsequent STO growth. This procedure provides framework for additional perovskite oxides to be deposited on semiconductors via chemical methods in addition to the integration of more sophisticated heterostructures already achievable by physical methods. PMID:27501462

  6. Single-Crystal Y2O3 Epitaxially on GaAs(001 and (111 Using Atomic Layer Deposition

    Directory of Open Access Journals (Sweden)

    Y. H. Lin

    2015-10-01

    Full Text Available Single-crystal atomic-layer-deposited (ALD Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films 2 nm thick were epitaxially grown on molecular beam epitaxy (MBE GaAs(001-4 \\(\\times\\ 6 and GaAs(111A-2 \\(\\times\\ 2 reconstructed surfaces. The in-plane epitaxy between the ALD-oxide films and GaAs was observed using \\textit{in-situ} reflection high-energy electron diffraction in our uniquely designed MBE/ALD multi-chamber system. More detailed studies on the crystallography of the hetero-structures were carried out using high-resolution synchrotron radiation X-ray diffraction. When deposited on GaAs(001, the Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films are of a cubic phase and have (110 as the film normal, with the orientation relationship being determined: Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\(\\(110\\[\\(001\\][\\(\\overline{1}10\\]//GaAs(\\(001\\[\\(110\\][\\(1\\overline{1}0\\]. On GaAs(\\(111\\A, the Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\ films are also of a cubic phase with (\\(111\\ as the film normal, having the orientation relationship of Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\(\\(111\\[\\(2\\overline{1}\\overline{1}\\] [\\(01\\overline{1}\\]//GaAs (\\(111\\ [\\(\\overline{2}11\\][\\(0\\overline{1}1\\]. The relevant orientation for the present/future integrated circuit platform is (\\(001\\. The ALD-Y\\(_{\\mathrm{2}}\\O\\(_{\\mathrm{3}}\\/GaAs(\\(001\\-4 \\(\\times\\ 6 has shown excellent electrical properties. These include small frequency dispersion in the capacitance-voltage CV curves at accumulation of ~7% and ~14% for the respective p- and n-type samples with the measured frequencies of 1 MHz to 100 Hz. The interfacial trap density (Dit is low of ~10\\(^{12}\\ cm\\(^{−2}\\eV\\(^{−1}\\ as extracted from measured quasi-static CVs. The frequency dispersion at accumulation and the D\\(_{it}\\ are the lowest ever achieved among all the ALD-oxides on GaAs(\\(001\\.

  7. Zinc sulfide and terbium-doped zinc sulfide films grown by traveling wave reactor atomic layer epitaxy

    CERN Document Server

    Yun, S J; Nam, K S

    1998-01-01

    Zinc sulfide (ZnS) and terbium-doped ZnS (ZnS:Tb) thin films were grown by traveling wave reactor atomic layer epitaxy (ALE). In the present work, ZnCl sub 2 , H sub 2 S, and tris (2,2,6,6-tetramethyl-3,5-heptandionato) terbium (Tb(tmhd) sub 3) were used as the precursors. The dependence of crystallinity and Cl content of ZnS films was investigated on the growth temperature. ZnS and ZnS:Tb films grown at temperatures ranging from 400 to 500 .deg. C showed a hexagonal-2H crystalline structure. The crystallinity of ZnS film was greatly enhanced as the temperature increased. At growth temperatures higher than 450.deg.C, the films showed preferred orientation with mainly (002) diffraction peak. The Cl content decreased from approximately 9 to 1 at.% with the increase in growth temperature from 400 to 500 .deg. C. The segregation of Cl near the surface region and the incorporation of O from Tb(tmhd) sub 3 during ALE process were also observed using Auger electron spectroscopy. The ALE-grown ZnS and ZnS:Tb films re...

  8. Atomic layer epitaxy of (CdTe) sub m (ZnTe) sub n -ZnTe multiquantum wells on (001)GaAs substrate

    Energy Technology Data Exchange (ETDEWEB)

    Li Jie; He Li; Shan Wei; Cheng Xingyu; Yuan Shixin (Shanghai Inst. of Technical Physics, Academia Sinica (China))

    1991-05-01

    (CdTe){sub m}(ZnTe){sub n}-ZnTe multiquantum well structure has been proposed and grown on (001)GaAs substrate by atomic layer epitaxy. Growth has been investigated using reflection high energy electron diffraction. Material characterizations have been performed by X-ray diffraction and photoluminescence. With this structure, great improvements have been made in crystalline quality compared with CdTe-ZnTe multiquantum wells, due to the reduction of misfit dislocations. (orig.).

  9. Preparation of bismuth telluride thin film by electrochemical atomic layer epitaxy(ECALE)

    Institute of Scientific and Technical Information of China (English)

    ZHU Wen; YANG Junyou; GAO Xianhui; HOU Jie; BAO Siqian; FAN Xian

    2007-01-01

    Thin-layer electrochemical studies of the underpotential deposition(UPD)of Bi and Te on cold rolled silver substrate have been performed.The voltammetric analysis of underpotential shift demonstrates that the initial Te UPD on Bi-covered Ag and Bi UPD on Te-covered Ag fitted UPD dynamics mechanism.A thin film of bismuth telluride was formed by alternately depositing Te and Bi via an automated flow deposition system.X-ray diffraction indicated the deposits of Bi2Te3.Energy Dispersive X-ray Detector quantitative analysis gave a 2:3 stoichiornetric ratio of Bi to Te,which was consistent with X-ray Diffraction results.Electron probe microanalysis of the deposits showed a network structure that results from the surface defects of the cold rolled Ag substrate and the lattice mismatch between substrate and deposit.

  10. High-temperature atomic layer epitaxy of TiO2 from TICl4 and H2O2-H2O

    International Nuclear Information System (INIS)

    Epitaxial TiO2 films were grown on off-cut α-Al2O3 (0112) (R-plane sapphire) substrates by gas-phase atomic layer deposition at 550-750 degrees C. X-ray diffraction and reflection high-energy electron diffraction measurements showed that the films had a two-domain (101) textured rutile structure. The domains made a straight angle about the normal to the substrate (0112) plane; those quantitatively superior were 3 degrees inclined with respect to the plane, resulting in the overall orientation relationship (0112) [2110]sapphire//(101)[010],[010](3 degrees)rutile. An account of the two-domain growth was given. The epitaxial quality worsened with the increase in the deposition temperature. (author)

  11. Dynamic atomic layer epitaxy of InN on/in +c-GaN matrix: Effect of “In+N” coverage and capping timing by GaN layer on effective InN thickness

    Energy Technology Data Exchange (ETDEWEB)

    Yoshikawa, Akihiko, E-mail: yoshi@faculty.chiba-u.jp [Center for SMART Green Innovation Research, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Graduate School of Engineering, Kogakuin University, Hachioji, Tokyo 192-0015 (Japan); Kusakabe, Kazuhide; Hashimoto, Naoki [Center for SMART Green Innovation Research, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Hwang, Eun-Sook; Itoi, Takaomi [Graduate School of Engineering, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan)

    2016-01-11

    The growth front in the self-organizing and self-limiting epitaxy of ∼1 monolayer (ML)-thick InN wells on/in +c-GaN matrix by molecular beam epitaxy (MBE) has been studied in detail, with special attention given to the behavior and role of the N atoms. The growth temperatures of interest are above 600 °C, far higher than the typical upper critical temperature of 500 °C in MBE. It was confirmed that 2 ML-thick InN wells can be frozen/inserted in GaN matrix at 620 °C, but it was found that N atoms at the growth front tend to selectively re-evaporate more quickly than In atoms at temperatures higher than 650 °C. As a result, the effective thickness of inserted InN wells in the GaN matrix at 660–670 °C were basically 1 ML or sub-ML, even though they were capped by a GaN barrier at the time of 2 ML “In+N” coverage. Furthermore, it was found that the N atoms located below In atoms in the dynamic atomic layer epitaxy growth front had remarkably weaker bonding to the +c-GaN surface.

  12. Atomic layer epitaxy of Ruddlesden-Popper SrO(SrTiO{sub 3}){sub n} films by means of metalorganic aerosol deposition

    Energy Technology Data Exchange (ETDEWEB)

    Jungbauer, M.; Hühn, S.; Moshnyaga, V. [Erstes Physikalisches Institut, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen (Germany); Egoavil, R.; Tan, H.; Verbeeck, J.; Van Tendeloo, G. [EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp (Belgium)

    2014-12-22

    We report an atomic layer epitaxial growth of Ruddlesden-Popper (RP) thin films of SrO(SrTiO{sub 3}){sub n} (n = ∞, 2, 3, 4) by means of metalorganic aerosol deposition (MAD). The films are grown on SrTiO{sub 3}(001) substrates by means of a sequential deposition of Sr-O/Ti-O{sub 2} atomic monolayers, monitored in-situ by optical ellipsometry. X-ray diffraction and transmission electron microscopy (TEM) reveal the RP structure with n = 2–4 in accordance with the growth recipe. RP defects, observed by TEM in a good correlation with the in-situ ellipsometry, mainly result from the excess of SrO. Being maximal at the film/substrate interface, the SrO excess rapidly decreases and saturates after 5–6 repetitions of the SrO(SrTiO{sub 3}){sub 4} block at the level of 2.4%. This identifies the SrTiO{sub 3} substrate surface as a source of RP defects under oxidizing conditions within MAD. Advantages and limitations of MAD as a solution-based and vacuum-free chemical deposition route were discussed in comparison with molecular beam epitaxy.

  13. Properties of Cu(thd)2 as a precursor to prepare Cu/SiO2 catalyst using the atomic layer epitaxy technique.

    Science.gov (United States)

    Chen, Ching S; Lin, Jarrn H; You, Jainn H; Chen, Chi R

    2006-12-20

    The new Cu/SiO2 catalyst is developed by the atomic layer epitaxy (ALE) method. The ALE-Cu/SiO2 catalyst with high dispersion and nanoscale Cu particles appears to have very different catalytic properties from those of the typical Cu-based catalysts, which have satisfactory thermal stability to resist the sintering of Cu particles at 773 K. Due to the formation of small Cu particles, the ALE-Cu/SiO2 can strongly bind CO and give high catalytic activity for CO2 converted to CO in the reverse water-gas-shift reaction. The catalytic activity decreases in the order of 2.4% ALE-Cu/SiO2 =... 2% Pt/SiO2 > 2% Pd/SiO2 > 10.3% IM-Cu/SiO2. PMID:17165704

  14. Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO2.

    Science.gov (United States)

    Vasu, K; Sreedhara, M B; Ghatak, J; Rao, C N R

    2016-03-01

    Employing atomic layer deposition, we have grown p-type epitaxial undoped and N-doped anatase TiO2(001) thin films on c-axis Al2O3 substrate. From X-ray diffraction and transmission electron microscopy studies, crystallographic relationships between the film and the substrate are found to be (001)TiO2//(0001)Al2O3 and [1̅10]TiO2//[011̅0]Al2O3. N-doping in TiO2 thin films enhances the hole concentration and mobility. The optical band gap of anatase TiO2 (3.23 eV) decreases to 3.07 eV upon N-doping. The epitaxial films exhibit room-temperature ferromagnetism and photoresponse. A TiO2-based homojunction diode was fabricated with rectification from the p-n junction formed between N-doped p-TiO2 and n-TiO2.

  15. Photoluminescence associated with basal stacking faults in c-plane ZnO epitaxial film grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Yang, S.; Kuo, C. C.; Hsieh, W. F. [Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Liu, W.-R. [Scientific Research Division, National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China); Lin, B. H. [Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China); Scientific Research Division, National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China); Hsu, H.-C. [Institute of Electro-Optical Science and Engineering and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 70101, Taiwan (China); Hsu, C.-H. [Scientific Research Division, National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China); Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan (China)

    2012-03-05

    Basal plane stacking faults (BSFs) with density of {approx}1 x 10{sup 6} cm{sup -1} are identified as the dominant defect in the annealed ZnO thin films grown on c-plane sapphire by atomic layer deposition. The dominant peak centered at 3.321 eV in low-temperature photoluminescence measurements is attributed to the emission from the BSFs. The emission mechanism is considered to be the confined indirect excitons in the region of quantum-well-like structure formed by the BSFs. The observed energy shift of 19 meV with respect to the BSF-bounded exciton at low temperature may be caused by the localization effect associated with the coupling between BSF quantum wells.

  16. Optical characterization of epitaxial semiconductor layers

    CERN Document Server

    Richter, Wolfgang

    1996-01-01

    The last decade has witnessed an explosive development in the growth of expitaxial layers and structures with atomic-scale dimensions. This progress has created new demands for the characterization of those stuctures. Various methods have been refined and new ones developed with the main emphasis on non-destructive in-situ characterization. Among those, methods which rely on the interaction of electromagnetic radiation with matter are particularly valuable. In this book standard methods such as far-infrared spectroscopy, ellipsometry, Raman scattering, and high-resolution X-ray diffraction are presented, as well as new advanced techniques which provide the potential for better in-situ characterization of epitaxial structures (such as reflection anistropy spectroscopy, infrared reflection-absorption spectroscopy, second-harmonic generation, and others). This volume is intended for researchers working at universities or in industry, as well as for graduate students who are interested in the characterization of ...

  17. Surface morphological evolution of epitaxial CrN(001) layers

    International Nuclear Information System (INIS)

    CrN layers, 57 and 230 nm thick, were grown on MgO(001) at Ts=600-800 deg. C by ultrahigh-vacuum magnetron sputter deposition in pure N2 discharges from an oblique deposition angle α=80 deg. . Layers grown at 600 deg. C nucleate as single crystals with a cube-on-cube epitaxial relationship with the substrate. However, rough surfaces with cauliflower-type morphologies cause the nucleation of misoriented CrN grains that develop into cone-shaped grains that protrude out of the epitaxial matrix to form triangular faceted surface mounds. The surface morphology of epitaxial CrN(001) grown at 700 deg. C is characterized by dendritic ridge patterns extending along the orthogonal directions superposed by square-shaped super mounds with edges. The ridge patterns are attributed to a Bales-Zangwill instability while the supermounds form due to atomic shadowing which leads to the formation of epitaxial inverted pyramids that are separated from the surrounding layer by tilted nanovoids. Growth at 800 deg. C yields complete single crystals with smooth surfaces. The root-mean-square surface roughness for 230-nm-thick layers decreases from 18.8 to 9.3 to 1.1 nm as Ts is raised from 600 to 700 to 800 deg. C. This steep decrease is due to a transition in the roughening mechanism from atomic shadowing to kinetic roughening. Atomic shadowing is dominant at 600 and 700 deg. C, where misoriented grains and supermounds, respectively, capture a larger fraction of the oblique deposition flux in comparison to the surrounding epitaxial matrix, resulting in a high roughening rate that is described by a power law with an exponent β>0.5. In contrast, kinetic roughening controls the surface morphology for Ts=800 deg. C, as well as the epitaxial fraction of the layers grown at 600 and 700 deg. C, yielding relatively smooth surfaces and β≤0.27

  18. The structure of epitaxial layers of uranium

    Energy Technology Data Exchange (ETDEWEB)

    Ward, R C C; Cowley, R A; Ling, N; Goetze, W [Clarendon Laboratory, Oxford Physics, Parks Road, Oxford OX1 3PU (United Kingdom); Lander, G H [European Commission, JRC, Institute for Transuranium Elements, Postfach 2340, D-76125 Karlsruhe (Germany); Stirling, W G [European Synchrotron Radiation Facility, BP220, F-38043, Grenoble, Cedex 09 (France)], E-mail: r.cowley@physics.ox.ac.uk

    2008-04-02

    Epitaxial layers of uranium have been grown on a variety of buffer/seed layers on sapphire substrates by UHV magnetron sputtering and their structure determined using x-ray diffraction. The buffer layers were epitaxial layers of niobium, tungsten and niobium covered by a seed layer of hcp gadolinium, on which uranium layers were grown to a thickness of 600 A. The x-ray diffraction results establish that the {alpha}-orthorhombic phase of uranium grows epitaxially in the (110) orientation on the niobium (110) buffer, while on the tungsten (110) buffer the growth planes of the {alpha}-uranium were (002) and for the growth on the gadolinium buffer the {alpha}-uranium was predominantly (021) oriented. These results show that epitaxial uranium films in selected orientations can be grown by using an appropriate buffer. To our knowledge this is the first report of epitaxial {alpha}-uranium films, and it is significant because of the difficulty of growing single crystals of {alpha}-uranium due to the occurrence of high temperature structural transformations.

  19. Growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices on +c-GaN template in dynamic atomic layer epitaxy

    Science.gov (United States)

    Kusakabe, Kazuhide; Hashimoto, Naoki; Itoi, Takaomi; Wang, Ke; Imai, Daichi; Yoshikawa, Akihiko

    2016-04-01

    The growth kinetics and structural perfection of (InN)1/(GaN)1-20 short-period superlattices (SPSs) were investigated with their application to ordered alloys in mind. The SPSs were grown on +c-GaN template at 650 °C by dynamic atomic layer epitaxy in conventional plasma-assisted molecular beam epitaxy. It was found that coherent structured InN/GaN SPSs could be fabricated when the thickness of the GaN barrier was 4 ML or above. Below 3 ML, the formation of SPSs was quite difficult owing to the increased strain in the SPS structure caused by the use of GaN as a template. The effective or average In composition of the (InN)1/(GaN)4 SPSs was around 10%, and the corresponding InN coverage in the ˜1 ML-thick InN wells was 50%. It was found that the effective InN coverage in ˜1 ML-thick InN wells could be varied with the growth conditions. In fact, the effective In composition could be increased up to 13.5%, i.e., the corresponding effective InN coverage was about 68%, by improving the capping/freezing speed by increasing the growth rate of the GaN barrier layer.

  20. Thermal Conductance of Nanoscale VOx Epitaxial Layers

    Science.gov (United States)

    Oh, Dong-Wook; Petrov, Ivan; Cahill, David

    2010-03-01

    We use time-domain thermoreflectance to measure the thermal conductance of VOx layers in epitaxial Pt/VOx/Pt structures. In particular, the metal-insulator-transition of VO2 at 70^oC allows us to systematically explore channels for heat transport between metals and correlated-electron systems. Pt/VOx/Pt layers are deposited on a sapphire substrates by reactive DC sputtering with O2 partial pressure varied from 0% to 13%. The thermal conductance has a strong dependence on thickness, 3-50 nm, and oxygen content, pure V to V2O5. The thermal conductance of ˜10 nm thick layers of V in series with the two Pt/V interfaces is 1 GW/m^2-K, comparable to what is expected based on the diffuse-mismatch model for electron transport at interfaces. The conductance of ˜10 nm thick layers of VO2 at room temperatures is remarkably high, 0.5 GW/m^2-K, for the series conductance of two metal-dielectric interfaces. At the metal-insulator-transition, the conductance of VO2 layers increases by only 10%, indicating that electrons in Pt and electrons in metallic VO2 are not strongly coupled.

  1. Interface engineering in epitaxial growth of layered oxides via a conducting layer insertion

    Energy Technology Data Exchange (ETDEWEB)

    Yun, Yu; Meng, Dechao; Wang, Jianlin [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui (China); Department of Materials Science and Engineering, University of Science and Technology of China, Hefei 230026, Anhui (China); Ma, Chao [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui (China); Zhai, Xiaofang, E-mail: xfzhai@ustc.edu.cn [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui (China); Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei 230026, Anhui (China); Huang, Haoliang; Fu, Zhengping; Peng, Ranran [Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui (China); Department of Materials Science and Engineering, University of Science and Technology of China, Hefei 230026, Anhui (China); Synergetic Innovation Center of Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei 230026, Anhui (China); Brown, Gail J. [Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433-7707 (United States); and others

    2015-07-06

    There is a long-standing challenge in the fabrication of layered oxide epitaxial films due to their thermodynamic phase-instability and the large stacking layer number. Recently, the demand for high-quality thin films is strongly pushed by their promising room-temperature multiferroic properties. Here, we find that by inserting a conducting and lattice matched LaNiO{sub 3} buffer layer, high quality m = 5 Bi{sub 6}FeCoTi{sub 3}O{sub 18} epitaxial films can be fabricated using the laser molecular beam epitaxy, in which the atomic-scale sharp interface between the film and the metallic buffer layer explains the enhanced quality. The magnetic and ferroelectric properties of the high quality Bi{sub 6}FeCoTi{sub 3}O{sub 18} films are studied. This study demonstrates that insertion of the conducting layer is a powerful method in achieving high quality layered oxide thin films, which opens the door to further understand the underline physics and to develop new devices.

  2. Growth of high purity semiconductor epitaxial layers by liquid phase epitaxy and their characterization

    Indian Academy of Sciences (India)

    S Dhar

    2005-07-01

    This paper briefly describes our work and the results on the growth of several III–V epitaxial semiconductor materials in high purity form by liquid phase epitaxy (LPE) technique. Various possible sources of impurities in such growth are listed and step-by-step procedures adopted to reduce them are discussed in particular reference to the growth of GaAs layers. The technique of growing very high purity layers by treating the melt with erbium is described for the growth of InGaAs and GaSb layers.

  3. Epitaxial few-layer graphene: towards single crystal growth

    Energy Technology Data Exchange (ETDEWEB)

    Hibino, H; Kageshima, H; Nagase, M, E-mail: hibino@will.brl.ntt.co.j [NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198 (Japan)

    2010-09-22

    We review our research towards single-crystal growth of epitaxial few-layer graphene (FLG) on SiC substrates. We have established a method for evaluating the number of graphene layers microscopically using low-energy electron microscopy. Scanning probe microscopy in air is also useful for estimating the number-of-layers distribution in epitaxial FLG. The number-of-layers dependence of the work function and C1s binding energy is determined using photoelectron emission microscopy. We investigate the growth processes of epitaxial FLG on the basis of the microscopic observations of surface morphology and graphene distribution. To gain insights into the growth mechanism, we calculate the SiC surface structures with various C coverages using a first-principles scheme. Uniform bilayer graphene a few micrometres in size is obtained by annealing in UHV.

  4. Strained-layer epitaxy of germanium-silicon alloys.

    Science.gov (United States)

    Bean, J C

    1985-10-11

    Despite the dominant position of silicon in semiconductor electronics, its use is ultimately limited by its incompatibility with other semiconducting materials. Strained-layer epitaxy overcomes problems of crystallographic compatibility and produces high-quality heterostructures of germanium-silicon layers on silicon. This opens the door to a range of electronic and photonic devices that are based on bandstructure physics. PMID:17842673

  5. Electric circuit model for strained-layer epitaxy

    Science.gov (United States)

    Kujofsa, Tedi; Ayers, John E.

    2016-11-01

    For the design and analysis of a strained-layer semiconductor device structure, the equilibrium strain profile may be determined numerically by energy minimization but this method is computationally intense and non-intuitive. Here we present an electric circuit model approach for the equilibrium analysis of an epitaxial stack, in which each sublayer may be represented by an analogous configuration involving a current source, a resistor, a voltage source, and an ideal diode. The resulting node voltages in the analogous electric circuit correspond to the equilibrium strains in the original epitaxial structure. This new approach enables analysis using widely accessible circuit simulators, and an intuitive understanding of electric circuits may be translated to the relaxation of strained-layer structures. In this paper, we describe the mathematical foundation of the electrical circuit model and demonstrate its application to epitaxial layers of Si1‑x Ge x grown on a Si (001) substrate.

  6. Fabrication of atomically smooth SrRuO3 thin films by laser molecular beam epitaxy

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    High-quality SrRuO3 (SRO) thin films and SrTiO3/SRO bilayer were grown epitaxially on SrTiO3 (STO)(001) substrates by laser molecular beam epitaxy. The results of in situ observation of reflection high-energy electron diffraction and ex situ X-ray diffraction θ -2θ scan indicate that the SRO thin films have good crystallinity. The measurements of atomic force microscopy and scan tunneling microscopy reveal that the surface of the SRO thin film is atomically smooth. The resistivity of the SRO thin film is 300 μΩ·cm at room temperature. Furthermore, the transmission electron microscopy study shows that the interfaces of STO/SRO and SRO/STO are very clear and no interfacial reaction layer was observed. The experimental results show that the SRO thin film is an excellent electrode material for devices based on perovskite oxide materials.

  7. Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

    OpenAIRE

    Federico Baiutti; Georg Christiani; Gennady Logvenov

    2014-01-01

    In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE) which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insulator-to-metal La2−xSrxNiO4. We briefly review the ALL-oxide MBE technique and its unique capabilities...

  8. Defect formation and carrier doping in epitaxial films of the infinite layer compound

    Energy Technology Data Exchange (ETDEWEB)

    Feenstra, R.; Pennycook, S.J.; Chisholm, M.F. [Oak Ridge National Lab., TN (United States). Solid State Div.] [and others

    1996-02-01

    The correlation between defect formation and carrier doping in epitaxial films of the infinite layer compound SrCuO{sub 2} has been studied via molecular beam epitaxy controlled layer-by-layer growth experiments, chemically resolved scanning transmission electron microscopy, scanning tunneling microscopy, x-ray diffraction, electrical transport measurements, and post-growth oxidation-reduction annealing. Based on the complementary information provided by these experiments, it is concluded that the carrier doping is dominated by the formation of an electron-doped, Sr and O deficient matrix under mildly oxidizing growth conditions. Hole-doping is induced by extended defects containing excess Sr atoms and may lead to superconductivity after high-temperature oxidation.

  9. Laser Molecular Beam Epitaxy Growth of BaTiO3 in Seven Thousands of Unit-Cell Layers

    Institute of Scientific and Technical Information of China (English)

    HUANG Yan-Hong; YANG Guo-Zhen; HE Meng; ZHAO Kun; TIAN Huan-Fang; L(U) Hui-Bin; JIN Kui-Juan; CHEN Zheng-Hao; ZHOU Yue-Liang; LI Jian-Qi

    2005-01-01

    @@ BaTiO3 thin films in seven thousands of unit-cell layers have been successfully fabricated on SrTiO3 (001)substrates by laser molecular beam epitaxy. The fine streak pattern and the undamping intensity oscillation of reflection high-energy electron diffraction indicate that the BaTiO3 film was layer-by-layer epitaxial growth. The measurements of scanning electron microscopy and atomic force microscopy show that surfaces of the BaTiO3thin film are atomically smooth. The measurements of x-ray diffraction and transmission electron microscopy,as well as selected-area electron diffraction revealthat the BaTiO3 thin film is a c-oriented epitaxial crystalline structure.

  10. Topological insulator Bi2Se3 thin films grown on double-layer graphene by molecular beam epitaxy

    OpenAIRE

    Song, Can-Li; Wang, Yi-Lin; Jiang, Ye-Ping; Zhang, Yi; Chang, Cui-Zu; Wang, Lili; He, Ke; Chen, Xi; Jia, Jin-Feng; Wang, Yayu; Fang, Zhong; Dai, Xi; Xie, Xin-Cheng; Qi, Xiao-Liang; Zhang, Shou-Cheng

    2010-01-01

    Atomically flat thin films of topological insulator Bi2Se3 have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi2Se3 films. The as-grown films without doping exhibit a low defect density of 1.0\\pm 0.2x1011/cm2, and become a bulk insulator at a ...

  11. Atomic oxidation of large area epitaxial graphene on 4H-SiC(0001)

    Energy Technology Data Exchange (ETDEWEB)

    Velez-Fort, E. [Laboratoire de Photonique et de Nanostructures (CNRS-LPN), Route de Nozay, 91460 Marcoussis (France); Institut de Minéralogie et de Physique des Milieux Condensés, CNRS–UMR7590, Sorbonne Universités-Pierre et Marie Curie, 4 Pl. Jussieu, 75005 Paris (France); Ouerghi, A. [Laboratoire de Photonique et de Nanostructures (CNRS-LPN), Route de Nozay, 91460 Marcoussis (France); Silly, M. G.; Sirtti, F. [Synchrotron-SOLEIL, Saint-Aubin, BP48, F91192 Gif sur Yvette Cedex (France); Eddrief, M.; Marangolo, M. [CNRS, UMR 7588, Institut des NanoSciences de Paris (INSP), F-75005 Paris (France); Sorbonne Universités, UPMC Univ. Paris 06, UMR 7588, INSP, F-75005 Paris (France); Shukla, A. [Institut de Minéralogie et de Physique des Milieux Condensés, CNRS–UMR7590, Sorbonne Universités-Pierre et Marie Curie, 4 Pl. Jussieu, 75005 Paris (France)

    2014-03-03

    Structural and electronic properties of epitaxial graphene on 4H-SiC were studied before and after an atomic oxidation process. X-ray photoemission spectroscopy indicates that oxygen penetrates into the substrate and decouples a part of the interface layer. Raman spectroscopy demonstrates the increase of defects due to the presence of oxygen. Interestingly, we observed on the near edge x-ray absorption fine structure spectra a splitting of the π* peak into two distinct resonances centered at 284.7 and 285.2 eV. This double structure smears out after the oxidation process and permits to probe the interface architecture between graphene and the substrate.

  12. Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    Federico Baiutti

    2014-05-01

    Full Text Available In this paper we present the atomic-layer-by-layer oxide molecular beam epitaxy (ALL-oxide MBE which has been recently installed in the Max-Planck Institute for Solid State Research and we report on its present status, providing some examples that demonstrate its successful application in the synthesis of different layered oxides, with particular reference to superconducting La2CuO4 and insulator-to-metal La2−xSrxNiO4. We briefly review the ALL-oxide MBE technique and its unique capabilities in the deposition of atomically smooth single-crystal thin films of various complex oxides, artificial compounds and heterostructures, introducing our goal of pursuing a deep investigation of such systems with particular emphasis on structural defects, with the aim of tailoring their functional properties by precise defects control.

  13. Silicon Carbide Epitaxial Films Studied by Atomic Force Microscopy

    Science.gov (United States)

    1996-01-01

    Silicon carbide (SiC) holds great potential as an electronic material because of its wide band gap energy, high breakdown electric field, thermal stability, and resistance to radiation damage. Possible aerospace applications of high-temperature, high-power, or high-radiation SiC electronic devices include sensors, control electronics, and power electronics that can operate at temperatures up to 600 C and beyond. Commercially available SiC devices now include blue light-emitting diodes (LED's) and high-voltage diodes for operation up to 350 C, with other devices under development. At present, morphological defects in epitaxially grown SiC films limit their use in device applications. Research geared toward reducing the number of structural inhomogeneities can benefit from an understanding of the type and nature of problems that cause defects. The Atomic Force Microscope (AFM) has proven to be a useful tool in characterizing defects present on the surface of SiC epitaxial films. The in-house High-Temperature Integrated Electronics and Sensors (HTIES) Program at the NASA Lewis Research Center not only extended the dopant concentration range achievable in epitaxial SiC films, but it reduced the concentration of some types of defects. Advanced structural characterization using the AFM was warranted to identify the type and structure of the remaining film defects and morphological inhomogeneities. The AFM can give quantitative information on surface topography down to molecular scales. Acquired, in part, in support of the Advanced High Temperature Engine Materials Technology Program (HITEMP), the AFM had been used previously to detect partial fiber debonding in composite material cross sections. Atomic force microscopy examination of epitaxial SiC film surfaces revealed molecular-scale details of some unwanted surface features. Growth pits propagating from defects in the substrate, and hillocks due, presumably, to existing screw dislocations in the substrates, were

  14. Atomically thin epitaxial template for organic crystal growth using graphene with controlled surface wettability.

    Science.gov (United States)

    Nguyen, Nguyen Ngan; Jo, Sae Byeok; Lee, Seong Kyu; Sin, Dong Hun; Kang, Boseok; Kim, Hyun Ho; Lee, Hansol; Cho, Kilwon

    2015-04-01

    A two-dimensional epitaxial growth template for organic semiconductors was developed using a new method for transferring clean graphene sheets onto a substrate with controlled surface wettability. The introduction of a sacrificial graphene layer between a patterned polymeric supporting layer and a monolayer graphene sheet enabled the crack-free and residue-free transfer of free-standing monolayer graphene onto arbitrary substrates. The clean graphene template clearly induced the quasi-epitaxial growth of crystalline organic semiconductors with lying-down molecular orientation while maintaining the "wetting transparency", which allowed the transmission of the interaction between organic molecules and the underlying substrate. Consequently, the growth mode and corresponding morphology of the organic semiconductors on graphene templates exhibited distinctive dependence on the substrate hydrophobicity with clear transition from lateral to vertical growth mode on hydrophilic substrates, which originated from the high surface energy of the exposed crystallographic planes of the organic semiconductors on graphene. The optical properties of the pentacene layer, especially the diffusion of the exciton, also showed a strong dependency on the corresponding morphological evolution. Furthermore, the effect of pentacene-substrate interaction was systematically investigated by gradually increasing the number of graphene layers. These results suggested that the combination of a clean graphene surface and a suitable underlying substrate could serve as an atomically thin growth template to engineer the interaction between organic molecules and aromatic graphene network, thereby paving the way for effectively and conveniently tuning the semiconductor layer morphologies in devices prepared using graphene. PMID:25798655

  15. Improved radiation tolerance of MAPS using a depleted epitaxial layer

    Energy Technology Data Exchange (ETDEWEB)

    Dorokhov, A., E-mail: Andrei.Dorokhov@IReS.in2p3.f [Institut Pluridisciplinaire Hubert Curien (IPHC), 23 rue du loess, BP 28, 67037 Strasbourg (France); Bertolone, G.; Baudot, J.; Brogna, A.S.; Colledani, C.; Claus, G.; De Masi, R. [Institut Pluridisciplinaire Hubert Curien (IPHC), 23 rue du loess, BP 28, 67037 Strasbourg (France); Deveaux, M. [Goethe-Universitaet Frankfurt am Main, Senckenberganlage 31, 60325 Frankfurt am Main (Germany); Doziere, G.; Dulinski, W. [Institut Pluridisciplinaire Hubert Curien (IPHC), 23 rue du loess, BP 28, 67037 Strasbourg (France); Fontaine, J.-C. [Groupe de Recherche en Physique des Hautes Energies (GRPHE), Universite de Haute Alsace, 61, rue Albert Camus, 68093 Mulhouse (France); Goffe, M.; Himmi, A.; Hu-Guo, Ch.; Jaaskelainen, K.; Koziel, M.; Morel, F.; Santos, C.; Specht, M.; Valin, I. [Institut Pluridisciplinaire Hubert Curien (IPHC), 23 rue du loess, BP 28, 67037 Strasbourg (France)

    2010-12-11

    Tracking performance of Monolithic Active Pixel Sensors (MAPS) developed at IPHC (Turchetta, et al., 2001) have been extensively studied (Winter, et al., 2001; Gornushkin, et al., 2002) . Numerous sensor prototypes, called MIMOSA, were fabricated and tested since 1999 in order to optimise the charge collection efficiency and power dissipation, to minimise the noise and to increase the readout speed. The radiation tolerance was also investigated. The highest fluence tolerable for a 10{mu}m pitch device was found to be {approx}10{sup 13}n{sub eq}/cm{sup 2}, while it was only 2x10{sup 12}n{sub eq}/cm{sup 2} for a 20{mu}m pitch device. The purpose of this paper is to show that the tolerance to non-ionising radiation may be extended up to O(10{sup 14}) n{sub eq}/cm{sup 2}. This goal relies on a fabrication process featuring a 15{mu}m thin, high resistivity ({approx}1k{Omega}cm) epitaxial layer. A sensor prototype (MIMOSA-25) was fabricated in this process to explore its detection performance. The depletion depth of the epitaxial layer at standard CMOS voltages (<5V) is similar to the layer thickness. Measurements with m.i.p.s show that the charge collected in the seed pixel is at least twice larger for the depleted epitaxial layer than for the undepleted one, translating into a signal-to-noise ratio (SNR) of {approx}50. Tests after irradiation have shown that this excellent performance is maintained up to the highest fluence considered (3x10{sup 13}n{sub eq}/cm{sup 2}), making evidence of a significant extension of the radiation tolerance limits of MAPS.

  16. Discrete atomic layers at the molecular level

    International Nuclear Information System (INIS)

    In this review, we deal with the syntheses of large discrete atomic layers at the molecular level. Spectroscopic measurements as well as X-ray crystallographic analyses lead to unambiguous characterizations of these layers. The molecular atomic layers can be considered to be parts of graphenes and related atomic layers, thereby helping to understand such indefinitely huge atomic layers or serving as seeds for the controlled synthesis of nanocarbons. (author)

  17. High quality GaN-based LED epitaxial layers grown in a homemade MOCVD system

    Institute of Scientific and Technical Information of China (English)

    Yin Haibo; Wang Xiaoliang; Ran Junxue; Hu Guoxin; Zhang Lu; Xiao Hongling; Li Jing; Li Jinmin

    2011-01-01

    A homemade 7 × 2 inch MOCVD system is presented.With this system,high quality GaN epitaxial layers,InGaN/GaN multi-quantum wells and blue LED structural epitaxial layers have been successfully grown.The non-uniformity of undoped GaN epitaxial layers is as low as 2.86%.Using the LED structural epitaxial layers,blue LED chips with area of 350 × 350μm2 were fabricated.Under 20 mA injection current,the optical output power of the blue LED is 8.62 mW.

  18. High quality GaN-based LED epitaxial layers grown in a homemade MOCVD system

    Energy Technology Data Exchange (ETDEWEB)

    Yin Haibo; Wang Xiaoliang; Ran Junxue; Hu Guoxin; Zhang Lu; Xiao Hongling; Li Jing; Li Jinmin, E-mail: hbyin@semi.ac.cn [Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

    2011-03-15

    A homemade 7 x 2 inch MOCVD system is presented. With this system, high quality GaN epitaxial layers, InGaN/GaN multi-quantum wells and blue LED structural epitaxial layers have been successfully grown. The non-uniformity of undoped GaN epitaxial layers is as low as 2.86%. Using the LED structural epitaxial layers, blue LED chips with area of 350 x 350 {mu}m{sup 2} were fabricated. Under 20 mA injection current, the optical output power of the blue LED is 8.62 mW. (semiconductor materials)

  19. High quality GaN-based LED epitaxial layers grown in a homemade MOCVD system

    Science.gov (United States)

    Haibo, Yin; Xiaoliang, Wang; Junxue, Ran; Guoxin, Hu; Lu, Zhang; Hongling, Xiao; Jing, Li; Jinmin, Li

    2011-03-01

    A homemade 7 × 2 inch MOCVD system is presented. With this system, high quality GaN epitaxial layers, InGaN/GaN multi-quantum wells and blue LED structural epitaxial layers have been successfully grown. The non-uniformity of undoped GaN epitaxial layers is as low as 2.86%. Using the LED structural epitaxial layers, blue LED chips with area of 350 × 350 μm2 were fabricated. Under 20 mA injection current, the optical output power of the blue LED is 8.62 mW.

  20. Greatly improved interfacial passivation of in-situ high κ dielectric deposition on freshly grown molecule beam epitaxy Ge epitaxial layer on Ge(100)

    Energy Technology Data Exchange (ETDEWEB)

    Chu, R. L. [Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Liu, Y. C.; Lee, W. C.; Huang, M. L.; Kwo, J., E-mail: raynien@phys.nthu.edu.tw, E-mail: mhong@phys.ntu.edu.tw [Department of Physics, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Lin, T. D.; Hong, M., E-mail: raynien@phys.nthu.edu.tw, E-mail: mhong@phys.ntu.edu.tw [Graduate Institute of Applied Physics and Department of Physics, National Taiwan University, Taipei 10617, Taiwan (China); Pi, T. W. [National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China)

    2014-05-19

    A high-quality high-κ/Ge interface has been achieved by combining molecule beam epitaxy grown Ge epitaxial layer and in-situ deposited high κ dielectric. The employment of Ge epitaxial layer has sucessfully buried and/or removed the residue of unfavorable carbon and native oxides on the chemically cleaned and ultra-high vacuum annealed Ge(100) wafer surface, as studied using angle-resolved x-ray photoelectron spectroscopy. Moreover, the scanning tunneling microscopy analyses showed the significant improvements in Ge surface roughness from 3.5 Å to 1 Å with the epi-layer growth. Thus, chemically cleaner, atomically more ordered, and morphologically smoother Ge surfaces were obtained for the subsquent deposition of high κ dielectrics, comparing with those substrates without Ge epi-layer. The capacitance-voltage (C-V) characteristics and low extracted interfacial trap density (D{sub it}) reveal the improved high-κ/Ge interface using the Ge epi-layer approach.

  1. Epitaxially Grown Layered MFI–Bulk MFI Hybrid Zeolitic Materials

    KAUST Repository

    Kim, Wun-gwi

    2012-11-27

    The synthesis of hybrid zeolitic materials with complex micropore-mesopore structures and morphologies is an expanding area of recent interest for a number of applications. Here we report a new type of hybrid zeolite material, composed of a layered zeolite material grown epitaxially on the surface of a bulk zeolite material. Specifically, layered (2-D) MFI sheets were grown on the surface of bulk MFI crystals of different sizes (300 nm and 10 μm), thereby resulting in a hybrid material containing a unique morphology of interconnected micropores (∼0.55 nm) and mesopores (∼3 nm). The structure and morphology of this material, referred to as a "bulk MFI-layered MFI" (BMLM) material, was elucidated by a combination of XRD, TEM, HRTEM, SEM, TGA, and N2 physisorption techniques. It is conclusively shown that epitaxial growth of the 2-D layered MFI sheets occurs in at least two principal crystallographic directions of the bulk MFI crystal and possibly in the third direction as well. The BMLM material combines the properties of bulk MFI (micropore network and mechanical support) and 2-D layered MFI (large surface roughness, external surface area, and mesoporosity). As an example of the uses of the BMLM material, it was incorporated into a polyimide and fabricated into a composite membrane with enhanced permeability for CO2 and good CO2/CH4 selectivity for gas separations. SEM-EDX imaging and composition analysis showed that the polyimide and the BMLM interpenetrate into each other, thereby forming a well-adhered polymer/particle microstructure, in contrast with the defective interfacial microstructure obtained using bare MFI particles. Analysis of the gas permeation data with the modified Maxwell model also allows the estimation of the effective volume of the BMLM particles, as well as the CO2 and CH4 gas permeabilities of the interpenetrated layer at the BMLM/polyimide interface. © 2012 American Chemical Society.

  2. Epitaxial Growth of Single Layer Blue Phosphorus: A New Phase of Two-Dimensional Phosphorus.

    Science.gov (United States)

    Zhang, Jia Lin; Zhao, Songtao; Han, Cheng; Wang, Zhunzhun; Zhong, Shu; Sun, Shuo; Guo, Rui; Zhou, Xiong; Gu, Cheng Ding; Yuan, Kai Di; Li, Zhenyu; Chen, Wei

    2016-08-10

    Blue phosphorus, a previously unknown phase of phosphorus, has been recently predicted by theoretical calculations and shares its layered structure and high stability with black phosphorus, a rapidly rising two-dimensional material. Here, we report a molecular beam epitaxial growth of single layer blue phosphorus on Au(111) by using black phosphorus as precursor, through the combination of in situ low temperature scanning tunneling microscopy and density functional theory calculation. The structure of the as-grown single layer blue phosphorus on Au(111) is explained with a (4 × 4) blue phosphorus unit cell coinciding with a (5 × 5) Au(111) unit cell, and this is verified by the theoretical calculations. The electronic bandgap of single layer blue phosphorus on Au(111) is determined to be 1.10 eV by scanning tunneling spectroscopy measurement. The realization of epitaxial growth of large-scale and high quality atomic-layered blue phosphorus can enable the rapid development of novel electronic and optoelectronic devices based on this emerging two-dimensional material. PMID:27359041

  3. Particle detectors based on semiconducting InP epitaxial layers

    Science.gov (United States)

    Yatskiv, R.; Grym, J.; Zdansky, K.

    2011-01-01

    A study of electrical properties and detection performance of two types of Indium Phosphide detector structures was performed: (i) with p-n-junction and (ii) with Schottky contact prepared on high purity p-type InP. The p-n junction detectors were based on a high purity InP:Pr layers of both n- and p- type conductivity with carrier concentration on the order of 1014 cm-3 grown on Sn doped n-type substrate. Schottky barrier detectors were prepared by vacuum evaporation of Pd on high purity p-type epitaxial layer grown on Mn doped p-type substrate. The detection performance of particle detectors was measured by pulse-height spectra with alpha particles emitted from 241Am source at room temperature.

  4. Particle detectors based on semiconducting InP epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Yatskiv, R; Grym, J; Zdansky, K, E-mail: yatskiv@ufe.cz [Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberska 57, 18251 Praha 8 (Czech Republic)

    2011-01-15

    A study of electrical properties and detection performance of two types of Indium Phosphide detector structures was performed: (i) with p-n-junction and (ii) with Schottky contact prepared on high purity p-type InP. The p-n junction detectors were based on a high purity InP:Pr layers of both n- and p- type conductivity with carrier concentration on the order of 10{sup 14} cm{sup -3} grown on Sn doped n-type substrate. Schottky barrier detectors were prepared by vacuum evaporation of Pd on high purity p-type epitaxial layer grown on Mn doped p-type substrate. The detection performance of particle detectors was measured by pulse-height spectra with alpha particles emitted from {sup 241}Am source at room temperature.

  5. Particle detectors based on semiconducting InP epitaxial layers

    International Nuclear Information System (INIS)

    A study of electrical properties and detection performance of two types of Indium Phosphide detector structures was performed: (i) with p-n-junction and (ii) with Schottky contact prepared on high purity p-type InP. The p-n junction detectors were based on a high purity InP:Pr layers of both n- and p- type conductivity with carrier concentration on the order of 1014 cm-3 grown on Sn doped n-type substrate. Schottky barrier detectors were prepared by vacuum evaporation of Pd on high purity p-type epitaxial layer grown on Mn doped p-type substrate. The detection performance of particle detectors was measured by pulse-height spectra with alpha particles emitted from 241Am source at room temperature.

  6. Effect of ZnO buffer layer thickness on the epitaxial growth of GaN by reactive magnetron sputtering

    International Nuclear Information System (INIS)

    Epitaxial GaN films were grown on sputtered ZnO buffer layers of thickness 25–200 nm over c-plane sapphire by reactive sputtering of GaAs in nitrogen at 700 °C. The epitaxial quality and microstructure have been studied by high resolution X-ray diffraction in phi (ϕ) and omega (ω) scan geometries. The surface morphology of epilayers was studied by atomic force microscopy and scanning electron microscopy and their crystalline quality was assessed by Raman spectroscopy. These studies have shown that ZnO buffer layers of 50–100 nm facilitate growth of GaN epilayers of high crystalline quality, compared to those grown on thinner and thicker ZnO buffer layers. - Highlights: • Epitaxial GaN films were grown on ZnO buffer layers over sapphire by sputtering. • Effect of ZnO buffer layer thickness on epitaxial quality of GaN films studied • Quality of GaN on 50–100 nm ZnO was better than that on thinner and thicker ZnO

  7. Growth and characterization of epitaxial aluminum layers on gallium-arsenide substrates for superconducting quantum bits

    Science.gov (United States)

    Tournet, J.; Gosselink, D.; Miao, G.-X.; Jaikissoon, M.; Langenberg, D.; McConkey, T. G.; Mariantoni, M.; Wasilewski, Z. R.

    2016-06-01

    The quest for a universal quantum computer has renewed interest in the growth of superconducting materials on semiconductor substrates. High-quality superconducting thin films will make it possible to improve the coherence time of superconducting quantum bits (qubits), i.e., to extend the time a qubit can store the amplitude and phase of a quantum state. The electrical losses in superconducting qubits highly depend on the quality of the metal layers the qubits are made from. Here, we report on the epitaxy of single-crystal Al (011) layers on GaAs (001) substrates. Layers with 110 nm thickness were deposited by means of molecular beam epitaxy at low temperature and monitored by in situ reflection high-energy electron diffraction performed simultaneously at four azimuths. The single-crystal nature of the layers was confirmed by ex situ high-resolution x-ray diffraction. Differential interference contrast and atomic force microscopy analysis of the sample’s surface revealed a featureless surface with root mean square roughness of 0.55 nm. A detailed in situ study allowed us to gain insight into the nucleation mechanisms of Al layers on GaAs, highlighting the importance of GaAs surface reconstruction in determining the final Al layer crystallographic orientation and quality. A highly uniform and stable GaAs (001)-(2× 4) reconstruction reproducibly led to a pure Al (011) phase, while an arsenic-rich GaAs (001)-(4× 4) reconstruction yielded polycrystalline films with an Al (111) dominant orientation. The near-atomic smoothness and single-crystal character of Al films on GaAs, in combination with the ability to trench GaAs substrates, could set a new standard for the fabrication of superconducting qubits.

  8. Topological insulator Bi2Se3 thin films grown on double-layer graphene by molecular beam epitaxy

    International Nuclear Information System (INIS)

    Atomically flat thin films of topological insulator Bi2Se3 have been grown on double-layer graphene formed on 6H-SiC(0001) substrate by molecular beam epitaxy. By a combined study of reflection high energy electron diffraction and scanning tunneling microscopy, we identified the Se-rich condition and temperature criterion for layer-by-layer growth of epitaxial Bi2Se3 films. The as-grown films without doping exhibit a low defect density of 1.0±0.2x1011/cm2, and become a bulk insulator at a thickness of ten quintuple layers, as revealed by in situ angle resolved photoemission spectroscopy measurement.

  9. Optimization of epitaxial layer design for high brightness tapered lasers

    Science.gov (United States)

    Tijero, J. M. G.; Rodriguez, D.; Borruel, L.; Sujecki, S.; Larkins, E. C.; Esquivias, I.

    2005-04-01

    A comparative simulation study of the optical output characteristics of tapered lasers with different epitaxial structure was performed. The simulation model self-consistently solves the steady state electrical and optical equations for the flared unstable resonator and was previously backed by experiments on one of the simulated structures. Three different epitaxial designs emitting at 975 nm were analyzed: a standard single quantum well symmetrically located in the confinement region (s-SQW), a double quantum well also symmetrically located (s-DQW) and an asymmetrically located double quantum well (a-DQW). The symmetric structures have different confinement factor but a similar ratio between the active layer thickness and the confinement factor, dQW/Γ, while the a-DQW has similar confinement factor than the s-SQW, but double dQW/Γ. A better performance is predicted for the a-DQW design, reaching considerably higher output power with good beam quality. The results are interpreted in terms of a lower density of power in the QW in the case of the a-DQW design, thus delaying to higher output power the onset of the non-linear effects that degrade the beam quality. The role of dQW/Γ as a figure of merit for high brightness tapered lasers is emphasized.

  10. Influence of layer thickness on the structure and the magnetic properties of Co/Pd epitaxial multilayer films

    Energy Technology Data Exchange (ETDEWEB)

    Tobari, Kousuke, E-mail: tobari@futamoto.elect.chuo-u.ac.jp [Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan); Ohtake, Mitsuru; Nagano, Katsumasa; Futamoto, Masaaki [Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan)

    2012-03-15

    Co/Pd epitaxial multilayer films were prepared on Pd(111){sub fcc} underlayers hetero-epitaxially grown on MgO(111){sub B1} single-crystal substrates at room temperature by ultra-high vacuum RF magnetron sputtering. In-situ reflection high energy electron diffraction shows that the in-plane lattice spacing of Co on Pd layer gradually decreases with increasing the Co layer thickness, whereas that of Pd on Co layer remains unchanged during the Pd layer formation. The CoPd alloy phase formation is observed around the Co/Pd interface. The atomic mixing is enhanced for thinner Co and Pd layers in multilayer structure. With decreasing the Co and the Pd layer thicknesses and increasing the repetition number of Co/Pd multilayer film, stronger perpendicular magnetic anisotropy is observed. The relationships between the film structure and the magnetic properties are discussed. - Highlights: Black-Right-Pointing-Pointer Epitaxial Co/Pd multilayer films are prepared on Pd(111){sub fcc} underlayers. Black-Right-Pointing-Pointer Lattice strain in Co layer and CoPd-alloy formation are noted around the interface. Black-Right-Pointing-Pointer Magnetic property dependence on layer thickness is reported.

  11. Epitaxial Growth of High-Quality Silicon Films on Double-Layer Porous Silicon

    Institute of Scientific and Technical Information of China (English)

    黄宜平; 竺士炀; 李爱珍; 王瑾; 黄靖云; 叶志镇

    2001-01-01

    The epitaxial growth of a high-quality silicon layer on double-layer porous silicon by ultra-high vacuum/chemical vapour deposition has been reported. The two-step anodization process results in a double-layer porous silicon structure with a different porosity. This double-layer porous silicon structure and an extended low-temperature annealing in a vacuum system was found to be helpful in subsequent silicon epitaxial growth. X-ray diffraction,cross-sectional transmission electron microscopy and spreading resistance testing were used in this work to study the properties of epitaxial silicon layers grown on the double-layer porous silicon. The results show that the epitaxial silicon layer is of good crystallinity and the same orientation with the silicon substrate and the porous silicon layer.

  12. Substrate-induced magnetism in epitaxial graphene buffer layers.

    Science.gov (United States)

    Ramasubramaniam, A; Medhekar, N V; Shenoy, V B

    2009-07-01

    Magnetism in graphene is of fundamental as well as technological interest, with potential applications in molecular magnets and spintronic devices. While defects and/or adsorbates in freestanding graphene nanoribbons and graphene sheets have been shown to cause itinerant magnetism, controlling the density and distribution of defects and adsorbates is in general difficult. We show from first principles calculations that graphene buffer layers on SiC(0001) can also show intrinsic magnetism. The formation of graphene-substrate chemical bonds disrupts the graphene pi-bonds and causes localization of graphene states near the Fermi level. Exchange interactions between these states lead to itinerant magnetism in the graphene buffer layer. We demonstrate the occurrence of magnetism in graphene buffer layers on both bulk-terminated as well as more realistic adatom-terminated SiC(0001) surfaces. Our calculations show that adatom density has a profound effect on the spin distribution in the graphene buffer layer, thereby providing a means of engineering magnetism in epitaxial graphene.

  13. Epitaxial growth and characterization of layered magnetic nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Bertacco, R. [LNESS, Dipartimento di Fisica del Politecnico di Milano, via Anzani 52, Como (Italy); Cantoni, M. [LNESS, Dipartimento di Fisica del Politecnico di Milano, via Anzani 52, Como (Italy); Riva, M. [LNESS, Dipartimento di Fisica del Politecnico di Milano, via Anzani 52, Como (Italy); Tagliaferri, A. [LNESS, Dipartimento di Fisica del Politecnico di Milano, via Anzani 52, Como (Italy); Ciccacci, F. [LNESS, Dipartimento di Fisica del Politecnico di Milano, via Anzani 52, Como (Italy)]. E-mail: franco.ciccacci@fisi.polimi.it

    2005-12-15

    We describe the construction and operation of an ultrahigh-vacuum system devoted to the study of layered magnetic nanostructures. The apparatus includes two growth chambers, where specimens nanostructured along the direction of growth (heterostructures, nanometric and subnanometric thin films and multilayers) are deposited either by molecular beam epitaxy or pulsed laser deposition, and a measurement chamber, where they are analyzed in situ by a variety of electron spectroscopies. Magnetic characterization is obtained by spin resolved inverse photoemission spectroscopy and magneto optical Kerr effect technique. Vacuum transfer towards other experimental facilities is also available. As examples of application, results from half metallic magnetic oxides, such as magnetite (Fe{sub 3}O{sub 4}) and manganite (La{sub 2/3}Sr{sub 1/3}MnO{sub 3}) thin films, and ferromagnet/semiconductor interfaces (Fe/Ge(0 0 1)) are also reported.

  14. Structure characterization of Pd/Co/Pd tri-layer films epitaxially grown on MgO single-crystal substrates

    Energy Technology Data Exchange (ETDEWEB)

    Tobari, Kousuke, E-mail: tobari@futamoto.elect.chuo-u.ac.jp; Ohtake, Mitsuru; Nagano, Katsumasa; Futamoto, Masaaki

    2011-09-30

    Pd/Co/Pd tri-layer films were prepared on MgO substrates of (001), (111), and (011) orientations at room temperature by ultra high vacuum rf magnetron sputtering. The detailed film structures around the Co/Pd and the Pd/Co interfaces are investigated by reflection high energy electron diffraction. Pd layers of (001){sub fcc}, (111){sub fcc}, and (011){sub fcc} orientations epitaxially grow on the respective MgO substrates. Strained fcc-Co(001) single-crystal layers are formed on the Pd(001){sub fcc} layers by accommodating the fairly large lattice mismatch between the Co and the Pd layers. On the Co layers,, Pd polycrystalline layers are formed. When Co films are formed on the Pd(111){sub fcc} and the Pd(011){sub fcc} layers, atomic mixing is observed around the Co/Pd interfaces and fcc-CoPd alloy phases are coexisting with Co crystals. The Co crystals formed on the Pd(111){sub fcc} layers consist of hcp(0001) + fcc(111) and Pd(111){sub fcc} epitaxial layers are formed on the Co layers. Co crystals epitaxially grow on the Pd(011){sub fcc} layers with two variants, hcp(11-bar 00) and fcc(111). On the Co layers, Pd(011){sub fcc} epitaxial layers are formed.

  15. Few layer epitaxial germanene: a novel two-dimensional Dirac material.

    Science.gov (United States)

    Dávila, María Eugenia; Le Lay, Guy

    2016-01-01

    Monolayer germanene, a novel graphene-like germanium allotrope akin to silicene has been recently grown on metallic substrates. Lying directly on the metal surfaces the reconstructed atom-thin sheets are prone to lose the massless Dirac fermion character and unique associated physical properties of free standing germanene. Here, we show that few layer germanene, which we create by dry epitaxy on a gold template, possesses Dirac cones thanks to a reduced interaction. This finding established on synchrotron-radiation-based photoemission, scanning tunneling microscopy imaging and surface electron diffraction places few layer germanene among the rare two-dimensional Dirac materials. Since germanium is currently used in the mainstream Si-based electronics, perspectives of using germanene for scaling down beyond the 5 nm node appear very promising. Other fascinating properties seem at hand, typically the robust quantum spin Hall effect for applications in spintronics and the engineering of Floquet Majorana fermions by light for quantum computing. PMID:26860590

  16. Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides

    Science.gov (United States)

    Ahmed, Adam S.; Wen, Hua; Ohta, Taisuke; Pinchuk, Igor V.; Zhu, Tiancong; Beechem, Thomas; Kawakami, Roland K.

    2016-08-01

    We report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by X-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of deposition show a strong dependence between the Dirac point and Sr oxidation. Subsequently, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.

  17. Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

    Energy Technology Data Exchange (ETDEWEB)

    Comes, Ryan; Liu Hongxue; Lu Jiwei [Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States); Gu, Man [Department of Physics, University of Virginia, Charlottesville, Virginia 22904 (United States); Khokhlov, Mikhail; Wolf, Stuart A. [Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States); Guilford College, Greensboro, North Carolina 27410 (United States)

    2013-01-14

    Complex oxide epitaxial film growth is a rich and exciting field, owing to the wide variety of physical properties present in oxides. These properties include ferroelectricity, ferromagnetism, spin-polarization, and a variety of other correlated phenomena. Traditionally, high quality epitaxial oxide films have been grown via oxide molecular beam epitaxy or pulsed laser deposition. Here, we present the growth of high quality epitaxial films using an alternative approach, the pulsed electron-beam deposition technique. We demonstrate all three epitaxial growth modes in different oxide systems: Frank-van der Merwe (layer-by-layer); Stranski-Krastanov (layer-then-island); and Volmer-Weber (island). Analysis of film quality and morphology is presented and techniques to optimize the morphology of films are discussed.

  18. Electron molecular beam epitaxy: Layer-by-layer growth of complex oxides via pulsed electron-beam deposition

    Science.gov (United States)

    Comes, Ryan; Gu, Man; Khokhlov, Mikhail; Liu, Hongxue; Lu, Jiwei; Wolf, Stuart A.

    2013-01-01

    Complex oxide epitaxial film growth is a rich and exciting field, owing to the wide variety of physical properties present in oxides. These properties include ferroelectricity, ferromagnetism, spin-polarization, and a variety of other correlated phenomena. Traditionally, high quality epitaxial oxide films have been grown via oxide molecular beam epitaxy or pulsed laser deposition. Here, we present the growth of high quality epitaxial films using an alternative approach, the pulsed electron-beam deposition technique. We demonstrate all three epitaxial growth modes in different oxide systems: Frank-van der Merwe (layer-by-layer); Stranski-Krastanov (layer-then-island); and Volmer-Weber (island). Analysis of film quality and morphology is presented and techniques to optimize the morphology of films are discussed.

  19. Schottky barriers based on metal nanoparticles deposited on InP epitaxial layers

    International Nuclear Information System (INIS)

    Fabrication of high-quality Schottky barriers on InP epitaxial layers prepared by liquid-phase epitaxy from rare-earth treated melts is reported. The Schottky structures are based on metal nanoparticles and a graphite layer deposited from colloidal solutions onto epitaxial layers with varying carrier concentration. The structures have notably high values of the barrier height and of the rectification ratio giving evidence of a small degree of the Fermi-level pinning. Electrical characteristics of these diodes are shown to be extremely sensitive to the exposure of gas mixtures with small hydrogen content. (paper)

  20. Schottky barriers based on metal nanoparticles deposited on InP epitaxial layers

    Science.gov (United States)

    Grym, Jan; Yatskiv, Roman

    2013-04-01

    Fabrication of high-quality Schottky barriers on InP epitaxial layers prepared by liquid-phase epitaxy from rare-earth treated melts is reported. The Schottky structures are based on metal nanoparticles and a graphite layer deposited from colloidal solutions onto epitaxial layers with varying carrier concentration. The structures have notably high values of the barrier height and of the rectification ratio giving evidence of a small degree of the Fermi-level pinning. Electrical characteristics of these diodes are shown to be extremely sensitive to the exposure of gas mixtures with small hydrogen content.

  1. Vertically aligned GaAs nanowires on graphite and few-layer graphene: generic model and epitaxial growth.

    Science.gov (United States)

    Munshi, A Mazid; Dheeraj, Dasa L; Fauske, Vidar T; Kim, Dong-Chul; van Helvoort, Antonius T J; Fimland, Bjørn-Ove; Weman, Helge

    2012-09-12

    By utilizing the reduced contact area of nanowires, we show that epitaxial growth of a broad range of semiconductors on graphene can in principle be achieved. A generic atomic model is presented which describes the epitaxial growth configurations applicable to all conventional semiconductor materials. The model is experimentally verified by demonstrating the growth of vertically aligned GaAs nanowires on graphite and few-layer graphene by the self-catalyzed vapor-liquid-solid technique using molecular beam epitaxy. A two-temperature growth strategy was used to increase the nanowire density. Due to the self-catalyzed growth technique used, the nanowires were found to have a regular hexagonal cross-sectional shape, and are uniform in length and diameter. Electron microscopy studies reveal an epitaxial relationship of the grown nanowires with the underlying graphitic substrates. Two relative orientations of the nanowire side-facets were observed, which is well explained by the proposed atomic model. A prototype of a single GaAs nanowire photodetector demonstrates a high-quality material. With GaAs being a model system, as well as a very useful material for various optoelectronic applications, we anticipate this particular GaAs nanowire/graphene hybrid to be promising for flexible and low-cost solar cells. PMID:22889019

  2. X—ray reflectivity measurement of δ—doped erbium profile in silicon molecular—beam epitaxial layer

    Institute of Scientific and Technical Information of China (English)

    JunWan; Q.J.Jia; 等

    1999-01-01

    Synchrontron radiation x-ray reflectivity measurement is used to study the concentration profile of a δ-doped Er layer in Si epitaxial film grown by molecular-beam epitaxy.The oscillation of the reflectivity amplitude as a function of reflection angle is observed in the experiment.By doing a theoretical simulation.the concentration profile of Er atoms could be deried.It is shown that the originally grown δ-doped Er layer changes into an expionentially decayed function due to the Er segregation.The temperature dependence of the 1/e decay length indicates that the segregation is a kinetically limited process.The activation energy is determined to be 0.044±0.005eV.

  3. Cross-Sectional Investigations on Epitaxial Silicon Solar Cells by Kelvin and Conducting Probe Atomic Force Microscopy: Effect of Illumination.

    Science.gov (United States)

    Narchi, Paul; Alvarez, Jose; Chrétien, Pascal; Picardi, Gennaro; Cariou, Romain; Foldyna, Martin; Prod'homme, Patricia; Kleider, Jean-Paul; I Cabarrocas, Pere Roca

    2016-12-01

    Both surface photovoltage and photocurrent enable to assess the effect of visible light illumination on the electrical behavior of a solar cell. We report on photovoltage and photocurrent measurements with nanometer scale resolution performed on the cross section of an epitaxial crystalline silicon solar cell, using respectively Kelvin probe force microscopy and conducting probe atomic force microscopy. Even though two different setups are used, the scans were performed on locations within 100-μm distance in order to compare data from the same area and provide a consistent interpretation. In both measurements, modifications under illumination are observed in accordance with the theory of PIN junctions. Moreover, an unintentional doping during the deposition of the epitaxial silicon intrinsic layer in the solar cell is suggested from the comparison between photovoltage and photocurrent measurements. PMID:26831693

  4. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    Energy Technology Data Exchange (ETDEWEB)

    Li, Wei, E-mail: weili.unsw@gmail.com; Varlamov, Sergey; Xue, Chaowei

    2014-09-30

    Highlights: • Crystallisation kinetic is used to analyse seed layer surface cleanliness. • Simplified RCA cleaning for the seed layer can shorten the epitaxy annealing duration. • RTA for the seed layer can improve the quality for both seed layer and epi-layer. • Epitaxial poly-Si solar cell performance is improved by RTA treated seed layer. - Abstract: This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, V{sub oc} and J{sub sc} than the one on the seed layer without RTA treatment.

  5. Surface composition of BaTiO{sub 3}/SrTiO{sub 3}(001) films grown by atomic oxygen plasma assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Barbier, A.; Stanescu, D.; Jegou, P.; Magnan, H. [CEA, IRAMIS, SPCSI, F-91191 Gif-sur-Yvette (France); Mocuta, C. [Synchrotron SOLEIL, L' Orme des Merisiers Saint-Aubin, BP 48, F-91192 Gif-sur-Yvette Cedex (France); Jedrecy, N. [Institut des Nano Sciences de Paris, UPMC-Sorbonne Universites, CNRS-UMR7588, 75005 Paris (France)

    2012-12-01

    We have investigated the growth of BaTiO{sub 3} thin films deposited on pure and 1% Nb-doped SrTiO{sub 3}(001) single crystals using atomic oxygen assisted molecular beam epitaxy and dedicated Ba and Ti Knudsen cells. Thicknesses up to 30 nm were investigated for various layer compositions. We demonstrate 2D growth and epitaxial single crystalline BaTiO{sub 3} layers up to 10 nm before additional 3D features appear; lattice parameter relaxation occurs during the first few nanometers and is completed at {approx}10 nm. The presence of a Ba oxide rich top layer that probably favors 2D growth is evidenced for well crystallized layers. We show that the Ba oxide rich top layer can be removed by chemical etching. The present work stresses the importance of stoichiometry and surface composition of BaTiO{sub 3} layers, especially in view of their integration in devices.

  6. Atomic layer deposition of nanoporous biomaterials

    Directory of Open Access Journals (Sweden)

    Roger J Narayan

    2010-03-01

    Full Text Available Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials.

  7. Effect of AlN intermediate layer on growing GaN film by hydride vapor phase epitaxy

    Institute of Scientific and Technical Information of China (English)

    LIN Chaotong; RUTERANA Pierre; CHEN Jun; YU Guanghui; LEI Benliang; WANG Xinzhong; YE Haohua; MENG Sheng; QI Ming; LI Aizhen; NOUET Gérard

    2006-01-01

    Thick GaN layer deposited by hydride vapor phase epitaxy (HVPE) on a metalorganic chemical vapor deposition (MOCVD) GaN template with a thin low temperature (LT) AlN intermediate layer was investigated.High resolution X-ray resolution diffraction (HRXRD) shows that the crystalline quality of thick GaN layer was improved compared with the template.As confirmed by atomic force microscopy (AFM) observations, the surface morphology of AlN intermediate layer helps to improve the nucleation of GaN epilayer.Photoluminescence (PL) spectra measurement shows its high optical quality and low compressive stress, and micro Raman measurement confirms the latter result.Thus, the deposition of the LT-AlN interlayer has promoted the growth of an HVPE-GaN layer with an excellent crystalline quality.

  8. Large domain growth of GaN epitaxial films on lattice-matched buffer layer ScAlMgO{sub 4}

    Energy Technology Data Exchange (ETDEWEB)

    Katase, Takayoshi [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)], E-mail: katase@lucid.msl.titech.ac.jp; Nomura, Kenji [ERATO-SORST, JST, in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Ohta, Hiromichi [ERATO-SORST, JST, in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Graduate School of Engineering, Nagoya University, Furo, Chikusa-ku, Nagoya 464-8603 (Japan); Yanagi, Hiroshi [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Kamiya, Toshio [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); ERATO-SORST, JST, in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Hirano, Masahiro [ERATO-SORST, JST, in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Hosono, Hideo [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); ERATO-SORST, JST, in Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Frontier Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)

    2009-04-15

    A homologous series compound ScAlO{sub 3}(MgO) (SCAM) has a superior lattice matching as small as {approx}1.4% in a-axis with GaN. This paper reports an efficient fabrication process of a single-crystalline SCAM buffer layer on a (1 1 1) yttria-stabilized zirconia (YSZ) substrate using pulsed laser deposition (PLD). A 10-nm thick ZnO epitaxial layer was used to induce solid-phase epitaxial growth of an amorphous (a-) SCAM layer formed at room temperature on (1 1 1) YSZ. It was found that the addition of excess Sc{sub 2}O{sub 3} and ZnO to a SCAM target used for PLD was needed to obtain single-crystalline SCAM films with atomically flat terraces-and-steps surfaces. The resulting single-crystalline SCAM films were examined as buffer layers to grow GaN by molecular beam epitaxy with a plasma nitrogen source. The GaN films were grown epitaxially on the SCAM/YSZ substrates with the epitaxial relationship of [0 0 0 1] GaN||[0 0 0 1] SCAM||[1 1 1] YSZ and [1 0 0] GaN||[11-20] SCAM||[1-10] YSZ. The SCAM buffer layers enhanced lateral growth of the GaN films owing to the good lattice matching.

  9. Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Claudel, A., E-mail: arnaud.claudel@grenoble-inp.org [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Fellmann, V. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Gélard, I. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Coudurier, N. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Sauvage, D. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Balaji, M. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Crystal Growth Center, Anna University, Chennai 600025 (India); and others

    2014-12-31

    Thin (0001) epitaxial aluminum nitride (AlN) layers were grown on c-plane sapphire using high temperature hydride vapor phase epitaxy. The experimental set-up consists of a vertical cold-wall quartz reactor working at low pressure in which the reactions take place on a susceptor heated by induction. The reactants used are ammonia and aluminum chlorides in situ formed via hydrogen chloride reaction with high purity aluminum pellets. As-grown AlN layers have been characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction, transmission electron microscopy, photoluminescence and Raman spectroscopies. The influence of the V/III ratio in the gas phase, from 1.5 to 15, on growth rate, surface morphology, roughness and crystalline quality is investigated in order to increase the quality of thin epitaxial AlN layers grown at high temperature. Typical growth rates of around 0.45 μm/h were obtained for such thin epitaxial AlN layers. The growth rate was unaffected by the V/III ratio. An optimum for roughness, crystalline quality and optical properties seems to exist at V/III = 7.5. As a matter of fact, for a V/III ratio of 7.5, best root mean square roughness and crystalline quality — measured on 0002 symmetric reflection — as low as 6.9 nm and 898 arcsec were obtained, respectively. - Highlights: • Growth of thin epitaxial AlN layers by high temperature hydride vapor phase epitaxy • Influence of V/III ratio on growth rate, morphology and crystalline quality • The effect of surface morphology on strain state and crystal quality is established.

  10. Optical properties of pure and Ce3+ doped gadolinium gallium garnet crystals and epitaxial layers

    International Nuclear Information System (INIS)

    Results of X-ray diffraction and low temperature optical absorption measurements of cerium doped gadolinium gallium garnet single crystals and epitaxial layers are reported. In the region of intra-configurational 4f–4f transitions the spectra of the bulk crystals exhibit the signatures of several different Ce3+ related centers. Apart from the dominant center, associated with Ce substituting gadolinium, at least three other centers are found, some of them attributed to the so-called antisite locations of rare-earth ions in the garnet host, i.e., in the Ga positions. X-ray diffraction data prove lattice expansion of bulk GGG crystals due to the presence of rare-earth antisites. The concentration of the additional Ce-related centers in epitaxial layers is much lower than in the bulk crystals. However, the Ce-doped layers incorporate a large amount of Pb from flux, which is the most probable source of nonradiative quenching of Ce luminescence, not observed in crystals grown by the Czochralski method. - Highlights: • Ce3+ multicenters found in Gadolinium Gallium Garnet crystals and epitaxial layers. • High quality epitaxial layers of pure and Ce-doped GGG were grown. • Luminescence quenching of Ce3+ by Pb ions from flux detected in GGG epitaxial layers. • X-ray diffraction allows measuring the amount of the rare-earth antisites in GGG

  11. Increasing the radiation resistance of single-crystal silicon epitaxial layers

    OpenAIRE

    Kurmashev Sh. D.; Kulinich O. A.; Brusenskaya G. I.; Verem’eva A. V.

    2014-01-01

    The authors investigate the possibility of increasing the radiation resistance of silicon epitaxial layers by creating radiation defects sinks in the form of dislocation networks of the density of 109—1012 m–2. Such networks are created before the epitaxial layer is applied on the front surface of the silicon substrate by its preliminary oxidation and subsequent etching of the oxide layer. The substrates were silicon wafers KEF-4.5 and KDB-10 with a diameter of about 40 mm, grown by the Czoch...

  12. Ultra-smooth epitaxial Ge grown on Si(001) utilizing a thin C-doped Ge buffer layer

    KAUST Repository

    Mantey, J.

    2013-01-01

    Here, we present work on epitaxial Ge films grown on a thin buffer layer of C doped Ge (Ge:C). The growth rate of Ge:C is found to slow over time and is thus unsuitable for thick (>20 nm) layers. We demonstrate Ge films from 10 nm to >150 nm are possible by growing pure Ge on a thin Ge:C buffer. It is shown that this stack yields exceedingly low roughness levels (comparable to bulk Si wafers) and contains fewer defects and higher Hall mobility compared to traditional heteroepitaxial Ge. The addition of C at the interface helps reduce strain by its smaller atomic radius and its ability to pin defects within the thin buffer layer that do not thread to the top Ge layer. © 2013 AIP Publishing LLC.

  13. Atom probe tomography characterisation of a laser diode structure grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Bennett, Samantha E.; Humphreys, Colin J.; Oliver, Rachel A. [Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ (United Kingdom); Smeeton, Tim M.; Hooper, Stewart E.; Heffernan, Jonathan [Sharp Laboratories of Europe Limited, Edmund Halley Road, Oxford Science Park, Oxford, OX4 4GB (United Kingdom); Saxey, David W.; Smith, George D. W. [Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH (United Kingdom)

    2012-03-01

    Atom probe tomography (APT) has been used to achieve three-dimensional characterization of a III-nitride laser diode (LD) structure grown by molecular beam epitaxy (MBE). Four APT data sets have been obtained, with fields of view up to 400 nm in depth and 120 nm in diameter. These data sets contain material from the InGaN quantum well (QW) active region, as well as the surrounding p- and n-doped waveguide and cladding layers, enabling comprehensive study of the structure and composition of the LD structure. Two regions of the same sample, with different average indium contents (18% and 16%) in the QW region, were studied. The APT data are shown to provide easy access to the p-type dopant levels, and the composition of a thin AlGaN barrier layer. Next, the distribution of indium within the InGaN QW was analyzed, to assess any possible inhomogeneity of the distribution of indium (''indium clustering''). No evidence for a statistically significant deviation from a random distribution was found, indicating that these MBE-grown InGaN QWs do not require indium clusters for carrier localization. However, the APT data show steps in the QW interfaces, leading to well-width fluctuations, which may act to localize carriers. Additionally, the unexpected presence of a small amount (x = 0.005) of indium in a layer grown intentionally as GaN was revealed. Finally, the same statistical method applied to the QW was used to show that the indium distribution within a thick InGaN waveguide layer in the n-doped region did not show any deviation from randomness.

  14. Observation of natural superlattice in AlXGa1-XAs layers grown by metalorganic vapor phase epitaxy

    Science.gov (United States)

    Pradhan, A.; Maitra, T.; Mukherjee, S.; Mukherjee, S.; Nayak, A.; Satpati, B.; Bhunia, S.

    2016-05-01

    Atomic Cu-Pt type ordering in monolayer scale is well known in Ga0.5 In0.5 P epitaxial layers leading to change in its bandgap. Despite wide scale use of AlxGa1-xAs (0peaks around (004) substrate Bragg peak as well as around (002) forbidden peak in XRC have been observed. Similar peaks are present in XRR also. We have presented detailed analysis of X-ray diffraction data with the help of kinematical diffraction theory here. The stability of the superlattice structures has been further investigated by annealing the sample at different temperatures.

  15. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    Science.gov (United States)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  16. Structural and magnetic properties of GaMnAs layers with high Mn content grown by Migration Enhanced Epitaxy on GaAs(100) substrates

    OpenAIRE

    J. Sadowski; Mathieu, R.; Svedlindh, P.; Domagala, J. Z.; Misiuk, J. Bak -; Swiatek, K.; Karlsteen, M.; Kanski, J.; Ilver, L.; Asklund, H.; Sodervall, U

    2001-01-01

    We have grown the ferromagnetic semiconductor GaMnAs containing up to 10% Mn by migration enhanced epitaxy at a substrate temperature of 150^oC. The alternate supply of As2 molecules and Ga and Mn atoms made it possible to grow single crystalline GaMnAs layers at very low substrate temperature, at which conventional molecular beam epitaxial growth under excess As supply is not possible due to As condensation. Secondary ion mass spectroscopy and X-ray diffraction measurements confirmed a highe...

  17. Photoluminescence Characterization of Boron-doped Si Layers Grown by Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    LI Cheng; LAI Hong-kai; CHEN Song-yan

    2005-01-01

    Photoluminescence spectra were used to characterize the boron-doped Si layers grown by molecular beam epitaxy using HBO2 as the doping source. The influence of boron doping concentration on the dislocation-related photoluminescence spectra of molecular beam epitaxy Si layers annealed at 900 ℃ was studied with different doping concentrations and growth temperature. The broad photoluminescence band(from 0.75 eV to 0.90 eV) including D1 and D2 bands was associated with high boron doping concentration in the samples, while D3 and D4 bands might be related to oxygen precipitates.

  18. Complex Materials by Atomic Layer Deposition.

    Science.gov (United States)

    Schwartzberg, Adam M; Olynick, Deirdre

    2015-10-14

    Complex materials are defined as nanostructured materials with combinations of structure and/or composition that lead to performance surpassing the sum of their individual components. There are many methods that can create complex materials; however, atomic layer deposition (ALD) is uniquely suited to control composition and structural parameters at the atomic level. The use of ALD for creating complex insulators, semiconductors, and conductors is discussed, along with its use in novel structural applications.

  19. Epitaxial growth of a monolayer WSe2-MoS2 lateral p-n junction with an atomically sharp interface

    KAUST Repository

    Li, Ming Yang

    2015-07-30

    Two-dimensional transition metal dichalcogenides (TMDCs) such as molybdenum sulfide MoS2 and tungsten sulfide WSe2 have potential applications in electronics because they exhibit high on-off current ratios and distinctive electro-optical properties. Spatially connected TMDC lateral heterojunctions are key components for constructing monolayer p-n rectifying diodes, light-emitting diodes, photovoltaic devices, and bipolar junction transistors. However, such structures are not readily prepared via the layer-stacking techniques, and direct growth favors the thermodynamically preferred TMDC alloys. We report the two-step epitaxial growth of lateral WSe2-MoS2 heterojunction, where the edge of WSe2 induces the epitaxial MoS2 growth despite a large lattice mismatch. The epitaxial growth process offers a controllable method to obtain lateral heterojunction with an atomically sharp interface.

  20. Epitaxial growth of a monolayer WSe2-MoS2 lateral p-n junction with an atomically sharp interface

    Science.gov (United States)

    Li, Ming-Yang; Shi, Yumeng; Cheng, Chia-Chin; Lu, Li-Syuan; Lin, Yung-Chang; Tang, Hao-Lin; Tsai, Meng-Lin; Chu, Chih-Wei; Wei, Kung-Hwa; He-Hau, Jr.; Chang, Wen-Hao; Suenaga, Kazu; Li, Lain-Jong

    2015-07-01

    Two-dimensional transition metal dichalcogenides (TMDCs) such as molybdenum sulfide MoS2 and tungsten sulfide WSe2 have potential applications in electronics because they exhibit high on-off current ratios and distinctive electro-optical properties. Spatially connected TMDC lateral heterojunctions are key components for constructing monolayer p-n rectifying diodes, light-emitting diodes, photovoltaic devices, and bipolar junction transistors. However, such structures are not readily prepared via the layer-stacking techniques, and direct growth favors the thermodynamically preferred TMDC alloys. We report the two-step epitaxial growth of lateral WSe2-MoS2 heterojunction, where the edge of WSe2 induces the epitaxial MoS2 growth despite a large lattice mismatch. The epitaxial growth process offers a controllable method to obtain lateral heterojunction with an atomically sharp interface.

  1. Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic-Ag(001) oriented nanodots

    Energy Technology Data Exchange (ETDEWEB)

    Kamiko, M.; Nose, K. [Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505 (Japan); Suenaga, R.; Kyuno, K. [Department of Material Science, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548 (Japan); Koo, J.-W.; Ha, J.-G. [Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701 (Korea, Republic of)

    2013-12-28

    The influence of Ti seed layers on the structure of self-organized Ag nanodots, obtained with a Ti seed-layer-assisted thermal agglomeration method, has been investigated. The samples were grown on MgO(001) single crystal substrates by RF magnetron sputter deposition. The samples were deposited at room temperature and post-annealed at 350 °C for 4 h while maintaining the chamber vacuum conditions. The results of atomic force microscopy (AFM) observations indicated that the insertion of the Ti seed layer (0.6–5.0 nm) between the MgO substrate and Ag layer promotes the agglomeration process, forming the nanodot array. Comparisons between the AFM images revealed that the size of the Ag nanodots was increased with an increase in the Ti seed layer thickness. The atomic concentration of the film surface was confirmed by X-ray photoelectron spectroscopy (XPS). The XPS result suggested that the nanodot surface mainly consisted of Ag. Moreover, X-ray diffraction results proved that the initial deposition of the Ti seed layer (0.6–5.0 nm) onto MgO(001) prior to the Ag deposition yielded high-quality fcc-Ag(001) oriented epitaxial nanodots. The optical absorbance spectra of the fabricated Ag nanodots with various Ti seed layer thicknesses were obtained in the visible light range.

  2. Characterization of thick epitaxial GaAs layers for X-ray detection

    CERN Document Server

    Samic, H; Donchev, V; Nghia, N X; Gandouzi, M; Zazoui, M; Bourgoin, J C; El-Abbassi, H; Rath, S; Sellin, P J

    2002-01-01

    We have studied the current-voltage and capacitance-voltage characteristics of p/i/n structures made on non-intentionally doped epitaxial GaAs layers grown by the chemical reaction method. Deep level transient spectroscopy demonstrates that these layers contain a low defect concentration. X-ray photoconductivity shows that the diffusion length is large. The homogeneity of the properties of these layers, which has been evaluated over large area (cm sup 2), is confirmed by photoluminescence mapping.

  3. InGaN light emitting diodes with a nanopipe layer formed from the GaN epitaxial layer.

    Science.gov (United States)

    Hsu, Wei-Ju; Chen, Kuei-Ting; Huang, Wan-Chun; Wu, Chia-Jung; Dai, Jing-Jie; Chen, Sy-Hann; Lin, Chia-Feng

    2016-05-30

    A Si-heavy doped GaN:Si epitaxial layer is transformed into a directional nanopipe GaN layer through a laser-scribing process and a selectively electrochemical (EC) etching process. InGaN light-emitting diodes (LEDs) with an EC-treated nanopipe GaN layer have a high light extraction efficiency. The direction of the nanopipe structure was directed perpendicular to the laser scribing line and was guided by an external bias electric field. An InGaN LED structure with an embedded nanopipe GaN layer can enhance external quantum efficiency through a one-step epitaxial growth process and a selective EC etching process. A birefringence optical property and a low effective refractive index were observed in the directional-nanopipe GaN layer.

  4. Perovskite thin films via atomic layer deposition.

    Science.gov (United States)

    Sutherland, Brandon R; Hoogland, Sjoerd; Adachi, Michael M; Kanjanaboos, Pongsakorn; Wong, Chris T O; McDowell, Jeffrey J; Xu, Jixian; Voznyy, Oleksandr; Ning, Zhijun; Houtepen, Arjan J; Sargent, Edward H

    2015-01-01

    A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3 NH3 PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm(-1) .

  5. Perovskite Thin Films via Atomic Layer Deposition

    KAUST Repository

    Sutherland, Brandon R.

    2014-10-30

    © 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

  6. Assessment of crystal quality and unit cell orientation in epitaxial Cu₂ZnSnSe₄ layers using polarized Raman scattering.

    Science.gov (United States)

    Krämmer, Christoph; Lang, Mario; Redinger, Alex; Sachs, Johannes; Gao, Chao; Kalt, Heinz; Siebentritt, Susanne; Hetterich, Michael

    2014-11-17

    We use polarization-resolved Raman spectroscopy to assess the crystal quality of epitaxial kesterite layers. It is demonstrated for the example of epitaxial Cu₂ZnSnSe₄ layers on GaAs(001) that "standing" and "lying" kesterite unit cell orientations (c'-axis parallel / perpendicular to the growth direction) can be distinguished by the application of Raman tensor analysis. From the appearance of characteristic intensity oscillations when the sample is rotated one can distinguish polycrystalline and epitaxial layers. The method can be transferred to kesterite layers oriented in any crystal direction and can shed light on the growth of such layers in general. PMID:25402065

  7. DOE-EPSCoR. Exchange interactions in epitaxial intermetallic layered systems

    Energy Technology Data Exchange (ETDEWEB)

    LeClair, Patrick R. [Univ. of Alabama, Tuscaloosa, AL (United States); Gary, Mankey J. [Univ. of Alabama, Tuscaloosa, AL (United States)

    2015-05-25

    The goal of this research is to develop a fundamental understanding of the exchange interactions in epitaxial intermetallic alloy thin films and multilayers, including films and multilayers of Fe-Pt, Co-Pt and Fe-P-Rh alloys deposited on MgO and Al2O3 substrates. Our prior results have revealed that these materials have a rich variety of ferromagnetic, paramagnetic and antiferromagnetic phases which are sensitive functions of composition, substrate symmetry and layer thickness. Epitaxial antiferromagnetic films of FePt alloys exhibit a different phase diagram than bulk alloys. The antiferromagnetism of these materials has both spin ordering transitions and spin orienting transitions. The objectives include the study of exchange-inversion materials and the interface of these materials with ferromagnets. Our aim is to formulate a complete understanding of the magnetic ordering in these materials, as well as developing an understanding of how the spin structure is modified through contact with a ferromagnetic material at the interface. The ultimate goal is to develop the ability to tune the phase diagram of the materials to produce layered structures with tunable magnetic properties. The alloy systems that we will study have a degree of complexity and richness of magnetic phases that requires the use of the advanced tools offered by the DOE-operated national laboratory facilities, such as neutron and x-ray scattering to measure spin ordering, spin orientations, and element-specific magnetic moments. We plan to contribute to DOE’s mission of producing “Materials by Design” with properties determined by alloy composition and crystal structure. We have developed the methods for fabricating and have performed neutron diffraction experiments on some of the most interesting phases, and our work will serve to answer questions raised about the element-specific magnetizations using the magnetic x-ray dichroism techniques and interface magnetism in layered structures

  8. Layered Atom Arrangements in Complex Materials

    Energy Technology Data Exchange (ETDEWEB)

    K.E. Sikafus; R.W.Grimes; S.M.Corish; A.R. Cleave; M.Tang; C.R.Stanek; B.P. Uberuaga; J.A.Valdez

    2005-04-15

    In this report, we develop an atom layer stacking model to describe systematically the crystal structures of complex materials. To illustrate the concepts, we consider a sequence of oxide compounds in which the metal cations progress in oxidation state from monovalent (M{sup 1+}) to tetravalent (M{sup 4+}). We use concepts relating to geometric subdivisions of a triangular atom net to describe the layered atom patterns in these compounds (concepts originally proposed by Shuichi Iida). We demonstrate that as a function of increasing oxidation state (from M{sup 1+} to M{sup 4+}), the layer stacking motifs used to generate each successive structure (specifically, motifs along a 3 symmetry axis), progress through the following sequence: MMO, MO, M{sub r}O, MO{sub r/s}O{sub u/v}, MOO (where M and O represent fully dense triangular atom nets and r/s and u/v are fractions used to describe partially filled triangular atom nets). We also develop complete crystallographic descriptions for the compounds in our oxidation sequence using trigonal space group R{bar 3}.

  9. Nano-soldering to single atomic layer

    Science.gov (United States)

    Girit, Caglar O.; Zettl, Alexander K.

    2011-10-11

    A simple technique to solder submicron sized, ohmic contacts to nanostructures has been disclosed. The technique has several advantages over standard electron beam lithography methods, which are complex, costly, and can contaminate samples. To demonstrate the soldering technique graphene, a single atomic layer of carbon, has been contacted, and low- and high-field electronic transport properties have been measured.

  10. Atomic-layer engineering of oxide superconductors

    Science.gov (United States)

    Bollinger, A. T.; Eckstein, J. N.; Dubuis, G.; Pavuna, D.; Božović, I.

    2012-02-01

    Molecular beam epitaxy technique has enabled synthesis of atomically smooth thin films, multilayers, and superlattices of cuprates and other complex oxides. Such heterostructures show high temperature superconductivity and enable novel experiments that probe the basic physics of this phenomenon. For example, it was established that high temperature superconductivity and anti-ferromagnetic phases separate on Ångström scale, while the pseudo-gap state apparently mixes with high temperature superconductivity over an anomalously large length scale (the "Giant Proximity Effect"). We review some recent experiments on such films and superlattices, including X-ray diffraction, atomic force microscopy, angle-resolved time of flight ion scattering and recoil spectroscopy, transport measurements, highresolution transmission electron microscopy, resonant X-ray scattering, low-energy muon spin resonance, and ultrafast photo-induced reflection high energy electron diffraction. The results include an unambiguous demonstration of strong coupling of in-plane charge excitations to out-of-plane lattice vibrations, a discovery of interface high temperature superconductivity that occurs in a single CuO2 plane, evidence for local pairs, and establishing tight limits on the temperature range of superconducting fluctuations.

  11. Atomic-Layer Engineering of Oxide Superconductors

    Energy Technology Data Exchange (ETDEWEB)

    Bozovic I.; Bollinger, A.T.; Eckstein, J.N.; Dubuis, G.; Pavuna, D.

    2012-03-01

    Molecular beam epitaxy technique has enabled synthesis of atomically smooth thin films, multilayers, and superlattices of cuprates and other complex oxides. Such heterostructures show high temperature superconductivity and enable novel experiments that probe the basic physics of this phenomenon. For example, it was established that high temperature superconductivity and anti-ferromagnetic phases separate on Angstrom scale, while the pseudo-gap state apparently mixes with high temperature superconductivity over an anomalously large length scale (the 'Giant Proximity Effect'). We review some recent experiments on such films and superlattices, including X-ray diffraction, atomic force microscopy, angle-resolved time of flight ion scattering and recoil spectroscopy, transport measurements, high resolution transmission electron microscopy, resonant X-ray scattering, low-energy muon spin resonance, and ultrafast photo-induced reflection high energy electron diffraction. The results include an unambiguous demonstration of strong coupling of in-plane charge excitations to out-of-plane lattice vibrations, a discovery of interface high temperature superconductivity that occurs in a single CuO{sub 2} plane, evidence for local pairs, and establishing tight limits on the temperature range of superconducting fluctuations.

  12. Spotting 2D atomic layers on aluminum nitride thin films

    Science.gov (United States)

    Chandrasekar, Hareesh; Bharadwaj B, Krishna; Vaidyuala, Kranthi Kumar; Suran, Swathi; Bhat, Navakanta; Varma, Manoj; Raghavan, Srinivasan

    2015-10-01

    Substrates for 2D materials are important for tailoring their fundamental properties and realizing device applications. Aluminum nitride (AIN) films on silicon are promising large-area substrates for such devices in view of their high surface phonon energies and reasonably large dielectric constants. In this paper epitaxial layers of AlN on 2″ Si wafers have been investigated as a necessary first step to realize devices from exfoliated or transferred atomic layers. Significant thickness dependent contrast enhancements are both predicted and observed for monolayers of graphene and MoS2 on AlN films as compared to the conventional SiO2 films on silicon, with calculated contrast values approaching 100% for graphene on AlN as compared to 8% for SiO2 at normal incidences. Quantitative estimates of experimentally measured contrast using reflectance spectroscopy show very good agreement with calculated values. Transistors of monolayer graphene on AlN films are demonstrated, indicating the feasibility of complete device fabrication on the identified layers.

  13. Spotting 2D atomic layers on aluminum nitride thin films.

    Science.gov (United States)

    Chandrasekar, Hareesh; Bharadwaj B, Krishna; Vaidyuala, Kranthi Kumar; Suran, Swathi; Bhat, Navakanta; Varma, Manoj; Srinivasan Raghavan

    2015-10-23

    Substrates for 2D materials are important for tailoring their fundamental properties and realizing device applications. Aluminum nitride (AIN) films on silicon are promising large-area substrates for such devices in view of their high surface phonon energies and reasonably large dielectric constants. In this paper epitaxial layers of AlN on 2″ Si wafers have been investigated as a necessary first step to realize devices from exfoliated or transferred atomic layers. Significant thickness dependent contrast enhancements are both predicted and observed for monolayers of graphene and MoS2 on AlN films as compared to the conventional SiO2 films on silicon, with calculated contrast values approaching 100% for graphene on AlN as compared to 8% for SiO2 at normal incidences. Quantitative estimates of experimentally measured contrast using reflectance spectroscopy show very good agreement with calculated values. Transistors of monolayer graphene on AlN films are demonstrated, indicating the feasibility of complete device fabrication on the identified layers.

  14. Electronic structures of single- and multi-layer epitaxial graphene on SiC (0001)

    Science.gov (United States)

    Kim, Seungchul; Ihm, Jisoon; Son, Young-Woo

    2009-03-01

    The electronic structures of single- and multi-layered epitaxial graphene on silicon carbide (0001) surface are studied theoretically. To calculate energy bands of the systems, we construct the simple Hamiltonian with tight-binding approximations. We confirm that the present simple model do give identical electronic structure to the previous ab-initio study on the single layer case [1]. We extend the model up to four epitaxial graphene layers to explain various interesting experimental findings. The roles of the coupling between graphenes and the buffer layer, and their large scale reconstructions to the electronic structures are also investigated. [1] S. Kim, J. Ihm, H. J. Choi, Y.-W. Son, Phys. Rev. Lett. 100, 176802 (2008).

  15. Mass transfer in liquid-phase epitaxy of two-layer systems

    Directory of Open Access Journals (Sweden)

    Dranchuk S. M.

    2012-10-01

    Full Text Available A liquid phase epitaxy diffusion model of a two-layer system at instable cooling speed of the solution-melt has been developed. It was discovered that the transition process continues even after the termination of cooling, due to which the layer growth continues as well. This effect is connected with to the hypothetical inertia of the diffusion process. The practical application of this phenomenon is shown.

  16. Atomic layer deposition of nanoporous biomaterials.

    Energy Technology Data Exchange (ETDEWEB)

    Narayan, R. J.; Adiga, S. P.; Pellin, M. J.; Curtiss, L. A.; Stafslien, S.; Chisholm, B.; Monteiro-Riviere, N. A.; Brigmon, R. L.; Elam, J. W.; Univ. of North Carolina; North Carolina State Univ.; Eastman Kodak Co.; North Dakota State Univ.; SRL

    2010-03-01

    Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials. Nanoporous alumina, also known as anodic aluminum oxide (AAO), is a nanomaterial that exhibits several unusual properties, including high pore densities, straight pores, small pore sizes, and uniform pore sizes. In 1953, Keller et al. showed that anodizing aluminum in acid electrolytes results in a thick layer of nearly cylindrical pores, which are arranged in a close-packed hexagonal cell structure. More recently, Matsuda & Fukuda demonstrated preparation of highly ordered platinum and gold nanohole arrays using a replication process. In this study, a negative structure of nanoporous alumina was initially fabricated and a positive structure of a nanoporous metal was subsequently fabricated. Over the past fifteen years, nanoporous alumina membranes have been used as templates for growth of a variety of nanostructured materials, including nanotubes, nanowires, nanorods, and nanoporous membranes.

  17. Epitaxial composite layers of electron donors and acceptors from very large polycyclic aromatic hydrocarbons.

    Science.gov (United States)

    Samorí, Paolo; Severin, Nikolai; Simpson, Christopher D; Müllen, Klaus; Rabe, Jürgen P

    2002-08-14

    Large polycyclic aromatic hydrocarbons (PAHs) can be considered as nanographenes, whose electron donating or accepting properties are controlled by their size and shape as well as functionalities in their periphery. Epitaxial thin films of them are targets for optoelectronic applications; however, large PAHs are increasingly difficult to process. Here we show that epitaxial layers of very large unsubstituted PAHs (C(42)H(18) and C(132)H(34)), as well as a mixed layer of C(42)H(18) with an electron acceptor, can be obtained by self-assembly from solution. The C(132)H(34) is by far the largest nanographene that up to now has been processed into ordered thin films; due to its size it cannot be sublimed in a vacuum. Scanning tunneling microscopy (STM) studies reveal that the interaction with the substrate induces a strong perturbation of the electronic structure of the pure donor in the first epitaxial monolayer. In a second epitaxial layer with a donor acceptor stoichiometry of 2:1 the molecules are unperturbed.

  18. Investigation of epitaxial silicon layers as a material for radiation hardened silicon detectors

    Energy Technology Data Exchange (ETDEWEB)

    Li, Z. [Brookhaven National Lab., Upton, NY (United States); Eremin, V.; Ilyashenko, I.; Ivanov, A.; Verbitskaya, E. [Russian Academy of Sciences, St. Petersburg (Russian Federation). Ioffe Physico-Technical Inst.; CERN RD-48 ROSE Collaboration

    1997-12-01

    Epitaxial grown thick layers ({ge} 100 micrometers) of high resistivity silicon (Epi-Si) have been investigated as a possible candidate of radiation hardened material for detectors for high-energy physics. As grown Epi-Si layers contain high concentration (up to 2 {times} 10{sup 12} cm{sup {minus}3}) of deep levels compared with that in standard high resistivity bulk Si. After irradiation of test diodes by protons (E{sub p} = 24 GeV) with a fluence of 1.5 {times} 10{sup 11} cm{sup {minus}2}, no additional radiation induced deep traps have been detected. A reasonable explanation is that there is a sink of primary radiation induced defects (interstitial and vacancies), possibly by as-grown defects, in epitaxial layers. The ``sinking`` process, however, becomes non-effective at high radiation fluences (10{sup 14} cm{sup {minus}2}) due to saturation of epitaxial defects by high concentration of radiation induced ones. As a result, at neutron fluence of 1 {times} 10{sup 14} cm{sup {minus}2} the deep level spectrum corresponds to well-known spectrum of radiation induced defects in high resistivity bulk Si. The net effective concentration in the space charge region equals to 3 {times} 10{sup 12} cm{sup {minus}3} after 3 months of room temperature storage and reveals similar annealing behavior for epitaxial as compared to bulk silicon.

  19. Spatial atomic layer deposition: a route towards further industrialization of atomic layer deposition

    NARCIS (Netherlands)

    Poodt, P.W.G.; Cameron, D.C.; Dickey, E.; George, S.M.; Kuznetsov, V.; Parsons, G.N.; Roozeboom, F.; Sundaram, G.; Vermeer, A.

    2012-01-01

    Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing. An approach to overcome this

  20. Properties of GaN on different polarity buffer layers by hydride vapour phase epitaxy

    Institute of Scientific and Technical Information of China (English)

    Qiu Kai; Zhong Fei; Li Xin-Hua; Yin Zhi-Jun; Ji Chang-Jian; Han Qi-Feng; Chen Jia-Rong; Cao Xian-Cun; Wang Yu-Qi

    2007-01-01

    This paper reports on N-, mixed-, and Ga-polarity buffer layers are grown by molecular beam epitaxy (MBE) on sapphire (0001) substrates, with the GaN thicker films grown on the buffer layer with different polarity by hydride vapour epitaxy technique (HVPE). The surface morphology, structural and optical properties of these HVPF-GaN epilayers are characterized by wet chemical etching, scanning electron microscope, x-ray diffraction, and photoluminescence spectrum respectively. It finds that the N-polarity film is unstable against the higher growth temperature and wet chemical etching,while that of GaN polarity one is stable. The results indicate that the crystalline quality of HVPE-GaN epilayers depends on the polarity of buffer layers.

  1. Lattice-matched HfN buffer layers for epitaxy of GaN on Si

    Energy Technology Data Exchange (ETDEWEB)

    Armitage, Robert; Yang, Qing; Feick, Henning; Gebauer, Joerg; Weber, Eicke R.; Shinkai, Satoko; Sasaki, Katsutaka

    2002-05-08

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using sputter-deposited hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 (mu)m. Initial results for GaN grown on the (111) surface show a photoluminescence peak width of 17 meV at 11 K, and an asymmetric x-ray rocking curve width of 20 arcmin. Wurtzite GaN on HfN/Si(001) shows reduced structural quality and peculiar low-temperature luminescence features. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  2. Epitaxial Growth of Hard Ferrimagnetic Mn3Ge Film on Rhodium Buffer Layer

    Directory of Open Access Journals (Sweden)

    Atsushi Sugihara

    2015-06-01

    Full Text Available Mn\\(_3\\Ge has a tetragonal Heusler-like D0\\(_{22}\\ crystal structure, exhibiting a large uniaxial magnetic anisotropy and small saturation magnetization due to its ferrimagnetic spin structure; thus, it is a hard ferrimagnet. In this report, epitaxial growth of a Mn\\(_3\\Ge film on a Rh buffer layer was investigated for comparison with that of a film on a Cr buffer layer in terms of the lattice mismatch between Mn\\(_3\\Ge and the buffer layer. The film grown on Rh had much better crystalline quality than that grown on Cr, which can be attributed to the small lattice mismatch. Epitaxial films of Mn\\(_3\\Ge on Rh show somewhat small coercivity (\\(H_{\\rm c}\\ = 12.6 kOe and a large perpendicular magnetic anisotropy (\\(K_{\\rm u}\\ = 11.6 Merg/cm\\(^3\\, comparable to that of the film grown on Cr.

  3. Atomically Thin Heterostructures Based on Single-Layer Tungsten Diselenide and Graphene

    KAUST Repository

    Lin, Yu-Chuan

    2014-11-10

    Heterogeneous engineering of two-dimensional layered materials, including metallic graphene and semiconducting transition metal dichalcogenides, presents an exciting opportunity to produce highly tunable electronic and optoelectronic systems. In order to engineer pristine layers and their interfaces, epitaxial growth of such heterostructures is required. We report the direct growth of crystalline, monolayer tungsten diselenide (WSe2) on epitaxial graphene (EG) grown from silicon carbide. Raman spectroscopy, photoluminescence, and scanning tunneling microscopy confirm high-quality WSe2 monolayers, whereas transmission electron microscopy shows an atomically sharp interface, and low energy electron diffraction confirms near perfect orientation between WSe2 and EG. Vertical transport measurements across the WSe2/EG heterostructure provides evidence that an additional barrier to carrier transport beyond the expected WSe2/EG band offset exists due to the interlayer gap, which is supported by theoretical local density of states (LDOS) calculations using self-consistent density functional theory (DFT) and nonequilibrium Green\\'s function (NEGF).

  4. A novel, layered phase in Ti-rich SrTiO3 epitaxial thin films.

    Science.gov (United States)

    Lee, Sungki; Damodaran, Anoop R; Gorai, Prashun; Oh, Nuri; Moyer, Jarrett A; Kwon, Ji-Hwan; Ferdous, Naheed; Shah, Amish; Chen, Zuhuang; Breckenfeld, Eric; Mangalam, R V K; Braun, Paul V; Schiffer, Peter; Shim, Moonsub; Zuo, Jian-Min; Ertekin, Elif; Martin, Lane W

    2015-02-01

    Sr2Ti7O14, a new phase, is synthesized by leveraging the innate chemical and thermo-dynamic instabilities in the SrTiO3-TiO2 system and non-equilibrium growth techniques. The chemical composition, epitaxial relationships, and orientation play roles in the formation of this novel layered phase, which, in turn, possesses unusual charge ordering, anti-ferromagnetic ordering, and low, glass-like thermal conductivity. PMID:25523179

  5. Evidence of deep traps in overgrown v-shaped defects in epitaxial GaN layers

    Science.gov (United States)

    Weidlich, P. H.; Schnedler, M.; Eisele, H.; Strauß, U.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2013-08-01

    The geometric and electronic structure of overgrown v-shaped defects in GaN epitaxial layers are investigated by cross-sectional scanning tunneling microscopy and spectroscopy. The v-defects are found to be hexagonal pit structures delimited by six {112¯2} planes. The electronic properties are inhomogeneous. In some areas the center of the v-defects exhibits a strongly inhibited tunneling current, indicating the presence of deep traps.

  6. High quality InAlN single layers lattice-matched to GaN grown by molecular beam epitaxy

    International Nuclear Information System (INIS)

    We report on properties of high quality ∼60 nm thick InAlN layers nearly in-plane lattice-matched to GaN, grown on c-plane GaN-on-sapphire templates by plasma-assisted molecular beam epitaxy. Excellent crystalline quality and low surface roughness are confirmed by X-ray diffraction, transmission electron microscopy, and atomic force microscopy. High annular dark field observations reveal a periodic in-plane indium content variation (8 nm period), whereas optical measurements evidence certain residual absorption below the band-gap. The indium fluctuation is estimated to be ± 1.2% around the nominal 17% indium content via plasmon energy oscillations assessed by electron energy loss spectroscopy with sub-nanometric spatial resolution.

  7. Texture of atomic layer deposited ruthenium

    OpenAIRE

    Musschoot, J.; Xie, Q; Deduytsche, D.; De Keyser, K; Longrie, D.; Haemers, J.; Van den Berghe, S.; Van Meirhaeghe, R. L.; D'Haen, Jan; Detavernier, C

    2010-01-01

    Ruthenium films were grown by plasma enhanced atomic layer deposition (ALD) on Si(1 0 0) and ALD TiN. X-ray diffraction (XRD) showed that the as-deposited films on Si(1 0 0) were polycrystalline, on TiN they were (0 0 2) oriented. After annealing at 800 degrees C for 60 s, all Ru films were strongly (0 0 2) textured and very smooth. Electron backscatter diffraction (EBSD) and transmission electron microscopy (TEM) demonstrated that the lateral grain size of the annealed films was several 100 ...

  8. Bioactive surfaces with atomic layer deposition

    OpenAIRE

    Kvalvik, Julie Nitsche

    2015-01-01

    The overall goal of this work has been to make bioactive surfaces with atomic layer deposition (ALD). To do this, a new ALD system with titanium tetraisopropoxide (TTIP) and lysine as precursors was developed with emphasis on studying the effects of pulsing times and deposition temperatures. TTIP was chosen as titanium is regarded to be biocompatible and lysine was chosen as poly-L-lysine is a part of the extra-cellular matrix (ECM) and hence affects cell adhesion. The effect of a water pulse...

  9. Atomic Layer Deposition from Dissolved Precursors.

    Science.gov (United States)

    Wu, Yanlin; Döhler, Dirk; Barr, Maïssa; Oks, Elina; Wolf, Marc; Santinacci, Lionel; Bachmann, Julien

    2015-10-14

    We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.

  10. Epitaxial growth of atomically flat gadolinia-doped ceria thin films by pulsed laser deposition

    International Nuclear Information System (INIS)

    Epitaxial growth of Ce0.8Gd0.2O2(CGO) films on (001) TiO2-terminated SrTiO3 substrates by pulsed laser deposition was investigated using in situ reflective high energy electron diffraction. The initial film growth shows a Stransky-Krastanov growth mode. However, this three-dimensional island formation is replaced by a two-dimensional island nucleation during further deposition, which results in atomically smooth CGO films. The obtained high-quality CGO films may be attractive for the electrolyte of solid-oxide fuel cells operating at low temperature. (orig.)

  11. Particle detectors based on semiconducting InP epitaxial layers

    OpenAIRE

    Yatskiv, R. (Roman); Grym, J.; Žďánský, K. (Karel)

    2011-01-01

    In this work, we present study of electrical properties and detection performance of two types of InP detector structures: (i) with p-n-junction and (ii) with Schottky contact prepared on high purity p-type InP. The p-n junction detectors were based on a high purity InP:Pr layers of both n- and p- type conductivity with carrier concentration on the order of 1014 cm-3 grown on Sn doped n-type substrate. Schottky barrier detectors were prepared by vacuum evaporation of Pd on high purity p-type ...

  12. Centimeter-scale synthesis of ultrathin layered MoO3 by van der Waals epitaxy

    OpenAIRE

    Molina-Mendoza, Aday J.; Lado, Jose Luis; Island, Joshua; Niño, Miguel Angel; Aballe, Lucía; Foerster, Michael; Bruno, Flavio Y; López-Moreno, Alejandro; Vaquero-Garzon, Luis; van der Zant, Herre S. J.; Rubio-Bollinger, Gabino; Agraït, Nicolas; Perez, Emilio; Fernandez-Rossier, Joaquin; Castellanos-Gomez, Andres

    2015-01-01

    We report on the large-scale synthesis of highly oriented ultrathin MoO3 layers using a simple and low-cost atmospheric pressure by van der Waals epitaxy growth on muscovite mica substrates. By this method we are able to synthetize high quality centimeter-scale MoO3 crystals with thicknesses ranging from 1.4 nm (two layers) up to a few nanometers. The crystals can be easily transferred to an arbitrary substrate (such as SiO2) by a deterministic transfer method and extensively characterized to...

  13. Ferromagnetism and the electronic band structure in (Ga,Mn)(Bi,As) epitaxial layers

    International Nuclear Information System (INIS)

    Impact of Bi incorporation into (Ga,Mn)As layers on their electronic- and band-structures as well as their magnetic and structural properties has been studied. Homogenous (Ga,Mn)(Bi,As) layers of high structural perfection have been grown by the low-temperature molecular-beam epitaxy technique. Post-growth annealing treatment of the layers results in an improvement of their structural and magnetic properties and an increase in the hole concentration in the layers. The modulation photoreflectance spectroscopy results are consistent with the valence-band model of hole-mediated ferromagnetism in the layers. This material combines the properties of (Ga,Mn)As and Ga(Bi,As) ternary compounds and offers the possibility of tuning its electrical and magnetic properties by controlling the alloy composition.

  14. Evaluation of methods for application of epitaxial layers of superconductor and buffer layers

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-06-01

    The recent achievements in a number of laboratories of critical currents in excess of 1.0x10{sup 6} amp/cm{sup 2} at 77K in YBCO deposited over suitably textured buffer/substrate composites have stimulated interest in the potential applications of coated conductors at high temperatures and high magnetic fields. As of today, two different approaches for obtaining the textured substrates have been identified. These are: Los Alamos National Laboratory`s (LANL) ion-beam assisted deposition called IBAD, to obtain a highly textured yttria-stabilized zirconia (YSZ) buffer on nickel alloy strips, and Oak Ridge National Laboratory`s (ORNL) rolling assisted, bi-axial texturized substrate option called RABiTS. Similarly, based on the published literature, the available options to form High Temperature Superconductor (HTS) films on metallic, semi-metallic or ceramic substrates can be divided into: physical methods, and non-physical or chemical methods. Under these two major groups, the schemes being proposed consist of: - Sputtering - Electron-Beam Evaporation - Flash Evaporation - Molecular Beam Epitaxy - Laser Ablation - Electrophoresis - Chemical Vapor Deposition (Including Metal-Organic Chemical Vapor Deposition) - Sol-Gel - Metal-Organic Decomposition - Electrodeposition, and - Aerosol/Spray Pyrolysis. In general, a spool- to-spool or reel-to-reel type of continuous manufacturing scheme developed out of any of the above techniques, would consist of: - Preparation of Substrate Material - Preparation and Application of the Buffer Layer(s) - Preparation and Application of the HTS Material and Required Post-Annealing, and - Preparation and Application of the External Protective Layer. These operations would be affected by various process parameters which can be classified into: Chemistry and Material Related Parameters; and Engineering and Environmental Based Parameters. Thus, one can see that for successful development of the coated conductors manufacturing process, an

  15. Effects of AIN nucleation layer thickness on crystal quality of AIN grown by plasma-assisted molecular beam epitaxy

    Institute of Scientific and Technical Information of China (English)

    Ren Fan; Hao Zhi-Biao; Hu Jian-Nan; Zhang Chen; Luo Yi

    2010-01-01

    In this paper,the effects of thickness of AIN nucleation layer grown at high temperature on AIN epi-layer crystalline quality are investigated.Crack-free AIN samples with various nucleation thicknesses are grown on sapphire substrates by plasma-assisted molecular beam epitaxy.The AIN crystalline quality is analysed by transmission electron microscope and x-ray diffraction(XRD)rocking curves in both(002)and(102)planes.The surface profiles of nucleation layer with different thicknesses after in-situ annealing are also analysed by atomic force microscope.A critical nucleation thickness for realising high quality AIN films is found.When the nucleation thickness is above a certain value,the(102)XRD full width at half maximum(FWHM)of AIN bulk increases with nucleation thickness increasing,whereas the(002)XRD FWHM shows an opposite trend.These phenomena can be attributed to the characteristics of nucleation islands and the evolution of crystal grains during AIN main layer growth.

  16. Epitaxial thin film growth of LiH using a liquid-Li atomic template

    International Nuclear Information System (INIS)

    We report on the synthesis of lithium hydride (LiH) epitaxial thin films through the hydrogenation of a Li melt, forming abrupt LiH/MgO interface. Experimental and first-principles molecular dynamics studies reveal a comprehensive microscopic picture of the crystallization processes, which sheds light on the fundamental atomistic growth processes that have remained unknown in the vapor-liquid-solid method. We found that the periodic structure that formed, because of the liquid-Li atoms at the film/MgO-substrate interface, serves as an atomic template for the epitaxial growth of LiH crystals. In contrast, films grown on the Al2O3 substrates indicated polycrystalline films with a LiAlO2 secondary phase. These results and the proposed growth process provide insights into the preparation of other alkaline metal hydride thin films on oxides. Further, our investigations open the way to explore fundamental physics and chemistry of metal hydrides including possible phenomena that emerge at the heterointerfaces of metal hydrides

  17. Epitaxial thin film growth of LiH using a liquid-Li atomic template

    Energy Technology Data Exchange (ETDEWEB)

    Oguchi, Hiroyuki, E-mail: oguchi@nanosys.mech.tohoku.ac.jp [Department of Nanomechanics, Tohoku University, Sendai 980-8579 (Japan); Micro System Integration Center (muSIC), Tohoku University, Sendai 980-0845 (Japan); Ikeshoji, Tamio; Orimo, Shin-ichi [Institute for Materials Research, Tohoku University, Sendai 980-8577 (Japan); Advanced Institute for Materials Research (AIMR), Tohoku University, Sendai 980-8577 (Japan); Ohsawa, Takeo; Shiraki, Susumu; Hitosugi, Taro [Advanced Institute for Materials Research (AIMR), Tohoku University, Sendai 980-8577 (Japan); Kuwano, Hiroki [Department of Nanomechanics, Tohoku University, Sendai 980-8579 (Japan)

    2014-11-24

    We report on the synthesis of lithium hydride (LiH) epitaxial thin films through the hydrogenation of a Li melt, forming abrupt LiH/MgO interface. Experimental and first-principles molecular dynamics studies reveal a comprehensive microscopic picture of the crystallization processes, which sheds light on the fundamental atomistic growth processes that have remained unknown in the vapor-liquid-solid method. We found that the periodic structure that formed, because of the liquid-Li atoms at the film/MgO-substrate interface, serves as an atomic template for the epitaxial growth of LiH crystals. In contrast, films grown on the Al{sub 2}O{sub 3} substrates indicated polycrystalline films with a LiAlO{sub 2} secondary phase. These results and the proposed growth process provide insights into the preparation of other alkaline metal hydride thin films on oxides. Further, our investigations open the way to explore fundamental physics and chemistry of metal hydrides including possible phenomena that emerge at the heterointerfaces of metal hydrides.

  18. Photoluminescence from GaAs nanodisks fabricated by using combination of neutral beam etching and atomic hydrogen-assisted molecular beam epitaxy regrowth

    Energy Technology Data Exchange (ETDEWEB)

    Kaizu, Toshiyuki; Okada, Yoshitaka [Research Center for Advanced Science and Technology, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8904 (Japan); Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan); Tamura, Yosuke; Igarashi, Makoto; Hu, Weiguo; Tsukamoto, Rikako [Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan); Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Yamashita, Ichiro [Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan); Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192 (Japan); Samukawa, Seiji [Japan Science and Technology Agency, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan); Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)

    2012-09-10

    We have fabricated GaAs nanodisk (ND) structures by using a combination of neutral beam etching process and atomic hydrogen-assisted molecular beam epitaxy regrowth. We have observed clear photoluminescence (PL) emissions from GaAs NDs. The peak energy showed a blueshift due to the quantum confinement in three spatial dimensions, and it agreed with the theoretically estimated transition energy. The PL results also showed that the cap-layer disks act as radiative recombination centers. We have confirmed that the PL emission originates from the GaAs NDs, and our approach is effective for the fabrication of high quality ND structures.

  19. Photoluminescence efficiency of BGaN epitaxial layers with high boron content

    Science.gov (United States)

    Jurkevičius, J.; Mickevičius, J.; Kadys, A.; Kolenda, M.; Tamulaitis, G.

    2016-07-01

    High-boron-content epitaxial layers of BGaN intended for lattice-matching with AlGaN in UV light emitters were grown on SiC substrate and GaN and AlN templates on sapphire. Photoluminescence (PL) of these layers was studied under quasi-steady-state conditions by varying temperature and excitation intensity. The PL spectra in the samples with different boron content and their dynamics evidence formation of boron-rich regions occupying a small fraction of the total layer volume and acting as the emission killers. The room-temperature PL efficiency of the BGaN epilayers was estimated and shown to drastically decrease at increasing boron content with no significant correlation with either the type of substrate/template or technological conditions of the layer deposition.

  20. Reduction in the crystal defect density of Zn Se layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Lopez L, M.; Perez C, A.; Luyo A, J.; Melendez L, M.; Tamura, M. [Departamento de Fisica, Centro de Investigacion y de Estudios Avanzados del instituto politecnico Nacional, A.P. 14-740, 07000 Mexico D.F. (Mexico); Mendez G, V.H.; Vidal, M.A. [Instituto de Investigacion en Comunicacion Optica, Universidad Autonoma de San Luis Potosi, Alvaro Obregon 64, 78000 San Luis Potosi (Mexico)

    2000-07-01

    We present a study of the molecular beam epitaxial (MBE) grown of Zn Se layers on Ga-As and Si substrates. For the growth on GaAs substrates we investigated the effects of introducing buffer layers of Al{sub x}Ga{sub 1-x} As and In{sub x}Ga{sub 1-x} As with x = 0.01. Moreover, an analysis by secondary ion mass spectroscopy revealed that the use of AlGaAs buffer layers effectively suppress the Ga segregation onto the Zn Se layers surface. On the other hand, for the growth of Zn Se on Si substrates, we achieved a significant improvement in the crystal quality of Zn Se by irradiating the Si substrates with plasma of nitrogen prior to the growth. (Author)

  1. Reduction in the crystal defect density of Zn Se layers grown by molecular beam epitaxy

    International Nuclear Information System (INIS)

    We present a study of the molecular beam epitaxial (MBE) grown of Zn Se layers on Ga-As and Si substrates. For the growth on GaAs substrates we investigated the effects of introducing buffer layers of AlxGa1-x As and InxGa1-x As with x = 0.01. Moreover, an analysis by secondary ion mass spectroscopy revealed that the use of AlGaAs buffer layers effectively suppress the Ga segregation onto the Zn Se layers surface. On the other hand, for the growth of Zn Se on Si substrates, we achieved a significant improvement in the crystal quality of Zn Se by irradiating the Si substrates with plasma of nitrogen prior to the growth. (Author)

  2. Atomic-layer deposition of silicon nitride

    CERN Document Server

    Yokoyama, S; Ooba, K

    1999-01-01

    Atomic-layer deposition (ALD) of silicon nitride has been investigated by means of plasma ALD in which a NH sub 3 plasma is used, catalytic ALD in which NH sub 3 is dissociated by thermal catalytic reaction on a W filament, and temperature-controlled ALD in which only a thermal reaction on the substrate is employed. The NH sub 3 and the silicon source gases (SiH sub 2 Cl sub 2 or SiCl sub 4) were alternately supplied. For all these methods, the film thickness per cycle was saturated at a certain value for a wide range of deposition conditions. In the catalytic ALD, the selective deposition of silicon nitride on hydrogen-terminated Si was achieved, but, it was limited to only a thin (2SiO (evaporative).

  3. Optical properties of pure and Ce{sup 3+} doped gadolinium gallium garnet crystals and epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Syvorotka, I.I. [Scientific Research Company “Carat”, 202 Stryjska Street, Lviv 79031 (Ukraine); Sugak, D. [Scientific Research Company “Carat”, 202 Stryjska Street, Lviv 79031 (Ukraine); Lviv Polytechnic National University, 12, S. Bandera Street, Lviv, 79013 (Ukraine); Wierzbicka, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Wittlin, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Cardinal Stefan Wyszyński University in Warsaw, ul. Dewajtis 5, 01-815 Warsaw (Poland); Przybylińska, H. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Barzowska, J. [Institute of Experimental Physics, Gdańsk University, ul. Wita Stwosza 57, Gdańsk (Poland); Barcz, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw (Poland); Berkowski, M.; Domagała, J. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Mahlik, S.; Grinberg, M. [Institute of Experimental Physics, Gdańsk University, ul. Wita Stwosza 57, Gdańsk (Poland); Ma, Chong-Geng [College of Mathematics and Physics, Chongqing University of Posts and Telecommunications, Chongqing 400065 (China); and others

    2015-08-15

    Results of X-ray diffraction and low temperature optical absorption measurements of cerium doped gadolinium gallium garnet single crystals and epitaxial layers are reported. In the region of intra-configurational 4f–4f transitions the spectra of the bulk crystals exhibit the signatures of several different Ce{sup 3+} related centers. Apart from the dominant center, associated with Ce substituting gadolinium, at least three other centers are found, some of them attributed to the so-called antisite locations of rare-earth ions in the garnet host, i.e., in the Ga positions. X-ray diffraction data prove lattice expansion of bulk GGG crystals due to the presence of rare-earth antisites. The concentration of the additional Ce-related centers in epitaxial layers is much lower than in the bulk crystals. However, the Ce-doped layers incorporate a large amount of Pb from flux, which is the most probable source of nonradiative quenching of Ce luminescence, not observed in crystals grown by the Czochralski method. - Highlights: • Ce{sup 3+} multicenters found in Gadolinium Gallium Garnet crystals and epitaxial layers. • High quality epitaxial layers of pure and Ce-doped GGG were grown. • Luminescence quenching of Ce{sup 3+} by Pb ions from flux detected in GGG epitaxial layers. • X-ray diffraction allows measuring the amount of the rare-earth antisites in GGG.

  4. Methods to reduce the loading effect in selective and non-selective epitaxial growth of sigec layers

    International Nuclear Information System (INIS)

    Various methods to reduce both global and local loading effect during non-selective and selective epitaxial growth of Si1-x-yGexCy (0.09≤x≤0.28 and 0≤y≤0.01) layers have been proposed. Evaluation of the proposed solutions for issues such as defect generation and the possibility for integration in device structures have been performed. The key point in these methods is based on reduction of surface diffusion of the adsorbed species on the oxide. In non-selective epitaxy, this was achieved by introducing a thin silicon polycrystalline seed layer on the oxide prior to Si1-x-yGexCy deposition. The thickness of this seed layer had a crucial role on both the global and local loading effect, and also on the epitaxial quality. Higher carbon content (y≥0.006) in Si1-x-yGexCy layers had no noticeable influence on the loading effect, however, the defect density was clearly increased in these layers. In selective epitaxy case, introducing square polycrystalline Si stripes around the oxide openings acting as diffusion barriers have reduced the loading effect effectively. Meanwhile, using Si nitride stripes showed no visible effect on Si1-x-yGexCy layer profile. Further decrease in loading effect can be performed by increasing the HCl partial pressure during epitaxy. Chemical-mechanical polishing (CMP) was performed to remove the polycrystalline stripe on the oxide

  5. Atomic Layer Deposition of Al2O3 on WSe2 Functionalized by Titanyl Phthalocyanine.

    Science.gov (United States)

    Park, Jun Hong; Fathipour, Sara; Kwak, Iljo; Sardashti, Kasra; Ahles, Christopher F; Wolf, Steven F; Edmonds, Mary; Vishwanath, Suresh; Xing, Huili Grace; Fullerton-Shirey, Susan K; Seabaugh, Alan; Kummel, Andrew C

    2016-07-26

    To deposit an ultrathin dielectric onto WSe2, monolayer titanyl phthalocyanine (TiOPc) is deposited by molecular beam epitaxy as a seed layer for atomic layer deposition (ALD) of Al2O3 on WSe2. TiOPc molecules are arranged in a flat monolayer with 4-fold symmetry as measured by scanning tunneling microscopy. ALD pulses of trimethyl aluminum and H2O nucleate on the TiOPc, resulting in a uniform deposition of Al2O3, as confirmed by atomic force microscopy and cross-sectional transmission electron microscopy. The field-effect transistors (FETs) formed using this process have a leakage current of 0.046 pA/μm(2) at 1 V gate bias with 3.0 nm equivalent oxide thickness, which is a lower leakage current than prior reports. The n-branch of the FET yielded a subthreshold swing of 80 mV/decade. PMID:27305595

  6. Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

    Science.gov (United States)

    Nourbakhsh, Amirhasan; Adelmann, Christoph; Song, Yi; Lee, Chang Seung; Asselberghs, Inge; Huyghebaert, Cedric; Brizzi, Simone; Tallarida, Massimo; Schmeißer, Dieter; van Elshocht, Sven; Heyns, Marc; Kong, Jing; Palacios, Tomás; de Gendt, Stefan

    2015-06-01

    Graphene oxide (GO) was explored as an atomically-thin transferable seed layer for the atomic layer deposition (ALD) of dielectric materials on any substrate of choice. This approach does not require specific chemical groups on the target surface to initiate ALD. This establishes GO as a unique interface which enables the growth of dielectric materials on a wide range of substrate materials and opens up numerous prospects for applications. In this work, a mild oxygen plasma treatment was used to oxidize graphene monolayers with well-controlled and tunable density of epoxide functional groups. This was confirmed by synchrotron-radiation photoelectron spectroscopy. In addition, density functional theory calculations were carried out on representative epoxidized graphene monolayer models to correlate the capacitive properties of GO with its electronic structure. Capacitance-voltage measurements showed that the capacitive behavior of Al2O3/GO depends on the oxidation level of GO. Finally, GO was successfully used as an ALD seed layer for the deposition of Al2O3 on chemically inert single layer graphene, resulting in high performance top-gated field-effect transistors.Graphene oxide (GO) was explored as an atomically-thin transferable seed layer for the atomic layer deposition (ALD) of dielectric materials on any substrate of choice. This approach does not require specific chemical groups on the target surface to initiate ALD. This establishes GO as a unique interface which enables the growth of dielectric materials on a wide range of substrate materials and opens up numerous prospects for applications. In this work, a mild oxygen plasma treatment was used to oxidize graphene monolayers with well-controlled and tunable density of epoxide functional groups. This was confirmed by synchrotron-radiation photoelectron spectroscopy. In addition, density functional theory calculations were carried out on representative epoxidized graphene monolayer models to correlate the

  7. Fabrication of ScAlMgO{sub 4} epitaxial thin films using ScGaO{sub 3}(ZnO){sub m} buffer layers and its application to lattice-matched buffer layer for ZnO epitaxial growth

    Energy Technology Data Exchange (ETDEWEB)

    Katase, Takayoshi [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)], E-mail: katase@lucid.msl.titech.ac.jp; Nomura, Kenji; Ohta, Hiromichi [ERATO-SORST, JST, in Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Yanagi, Hiroshi [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Kamiya, Toshio [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); ERATO-SORST, JST, in Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Hirano, Masahiro [ERATO-SORST, JST, in Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Hosono, Hideo [Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); ERATO-SORST, JST, in Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan); Frontier Collaborative Research Center, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503 (Japan)

    2008-07-01

    Single-crystalline thin films of ScAlMgO{sub 4} (SCAM) were fabricated on YSZ (111) substrates by reactive solid-phase epitaxy (R-SPE) using ScGaO{sub 3}(ZnO){sub m} (SGZO) single-crystalline buffer layers, which suppress interface reactions between the SCAM layers and the YSZ substrates. First, post-annealing of the SCAM layers fabricated by the R-SPE process was examined. When annealing temperature was raised to > 1200 {sup o}C, the formation of a spinel MgAl{sub 2}O{sub 4} phase was observed. This is due probably to out-diffusion of Sc ions from the SCAM layers to the YSZ substrates. By introducing an SGZO buffer layer, a single-phase SCAM layer with a step-and-terrace surface was obtained by annealing at 1450 {sup o}C without the spinel formation. The SCAM layer was grown heteroepitaxially with an epitaxial relationship of (000 l){sub SCAM} (111){sub YSZ} and (110){sub SCAM} (11-0){sub YSZ}. Atomically flat surfaces were eventually formed by chemical-mechanical polishing. The SCAM layer was applied to a lattice-matched buffer layer for the growth of ZnO film, leading to marked lateral growth of ZnO domains.

  8. Wet chemical deposition of single crystalline epitaxial manganite thin films with atomically flat surface

    International Nuclear Information System (INIS)

    We report the wet chemical deposition of single crystalline epitaxial thin films of the colossal magneto-resistive manganite La0.67Sr0.33MnO3 on the lattice-matched (001)-face of a La0.3Sr0.7Al0.65Ta0.35O3 substrate. Topographic images of these films taken with a scanning tunneling microscope show atomically flat terraces separated by steps of monatomic height. The resistivity of these films shows an insulator-metal transition at 310 K, nearly coincident with the Curie temperature of 340 K, found from magnetization measurements. The films show a magnetoresistance of 7% at 300 K and 1.2 T. Their saturation magnetization value at low temperatures is consistent with that of the bulk. - Highlights: ► Wet chemical deposition of La0.67Sr0.33MnO3 (LSMO) on a lattice-matched substrate. ► Single crystalline epitaxial LSMO films obtained. ► Flat terraces separated by monatomic steps observed by scanning tunneling microscope

  9. Propagation of Structural Disorder in Epitaxially Connected Quantum Dot Solids from Atomic to Micron Scale.

    Science.gov (United States)

    Savitzky, Benjamin H; Hovden, Robert; Whitham, Kevin; Yang, Jun; Wise, Frank; Hanrath, Tobias; Kourkoutis, Lena F

    2016-09-14

    Epitaxially connected superlattices of self-assembled colloidal quantum dots present a promising route toward exquisite control of electronic structure through precise hierarchical structuring across multiple length scales. Here, we uncover propagation of disorder as an essential feature in these systems, which intimately connects order at the atomic, superlattice, and grain scales. Accessing theoretically predicted exotic electronic states and highly tunable minibands will therefore require detailed understanding of the subtle interplay between local and long-range structure. To that end, we developed analytical methods to quantitatively characterize the propagating disorder in terms of a real paracrystal model and directly observe the dramatic impact of angstrom scale translational disorder on structural correlations at hundreds of nanometers. Using this framework, we discover improved order accompanies increasing sample thickness and identify the substantial effect of small fractions of missing epitaxial bonds on statistical disorder. These results have significant experimental and theoretical implications for the elusive goals of long-range carrier delocalization and true miniband formation. PMID:27540863

  10. Increasing the radiation resistance of single-crystal silicon epitaxial layers

    Directory of Open Access Journals (Sweden)

    Kurmashev Sh. D.

    2014-12-01

    Full Text Available The authors investigate the possibility of increasing the radiation resistance of silicon epitaxial layers by creating radiation defects sinks in the form of dislocation networks of the density of 109—1012 m–2. Such networks are created before the epitaxial layer is applied on the front surface of the silicon substrate by its preliminary oxidation and subsequent etching of the oxide layer. The substrates were silicon wafers KEF-4.5 and KDB-10 with a diameter of about 40 mm, grown by the Czochralski method. Irradiation of the samples was carried out using electron linear accelerator "Electronics" (ЭЛУ-4. Energy of the particles was 2,3—3,0 MeV, radiation dose 1015—1020 m–2, electron beam current 2 mA/m2. It is shown that in structures containing dislocation networks, irradiation results in reduction of the reverse currents by 5—8 times and of the density of defects by 5—10 times, while the mobility of the charge carriers is increased by 1,2 times. Wafer yield for operation under radiation exposure, when the semiconductor structures are formed in the optimal mode, is increased by 7—10% compared to the structures without dislocation networks. The results obtained can be used in manufacturing technology for radiation-resistant integrated circuits (bipolar, CMOS, BiCMOS, etc..

  11. Broadband electromagnetic response and ultrafast dynamics of few-layer epitaxial graphene

    Energy Technology Data Exchange (ETDEWEB)

    Choi, Hyunyong; Borondics, Ferenc; Siegel, David A.; Zhou, Shuyun Y.; Martin, Michael C.; Lanzara, Alessandra; Kaindl, Robert A.

    2009-03-26

    We study the broadband optical conductivity and ultrafast carrier dynamics of epitaxial graphene in the few-layer limit. Equilibrium spectra of nominally buffer, monolayer, and multilayer graphene exhibit significant terahertz and near-infrared absorption, consistent with a model of intra- and interband transitions in a dense Dirac electron plasma. Non-equilibrium terahertz transmission changes after photoexcitation are shown to be dominated by excess hole carriers, with a 1.2-ps mono-exponential decay that refects the minority-carrier recombination time.

  12. Temperature-dependent efficiency droop in AlGaN epitaxial layers and quantum wells

    Directory of Open Access Journals (Sweden)

    J. Mickevičius

    2016-04-01

    Full Text Available Luminescence efficiency droop has been studied in AlGaN epitaxial layers and multiple quantum wells (MQWs with different strength of carrier localization in a wide range of temperatures. It is shown that the dominant mechanism leading to droop, i.e., the efficiency reduction at high carrier densities, is determined by the carrier thermalization conditions and the ratio between carrier thermal energy and localization depth. The droop mechanisms, such as the occupation-enhanced redistribution of nonthermalized carriers, the enhancement of nonradiative recombination due to carrier delocalization, and excitation-enhanced carrier transport to extended defects or stimulated emission, are discussed.

  13. Meandering of overgrown v-shaped defects in epitaxial GaN layers

    Science.gov (United States)

    Weidlich, P. H.; Schnedler, M.; Portz, V.; Eisele, H.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2014-07-01

    The meandering of v-shaped defects in GaN(0001) epitaxial layers is investigated by cross-sectional scanning tunneling microscopy. The spatial position of v-shaped defects is mapped on ( 10 1 ¯ 0 ) cleavage planes using a dopant modulation, which traces the overgrown growth front. Strong lateral displacements of the apex of the v-shaped defects are observed. The lateral displacements are suggested to be induced by the meandering of threading dislocations present in the v-shaped defects. The meandering of the dislocation is attributed to interactions with inhomogeneous strain fields.

  14. Repulsive interactions between dislocations and overgrown v-shaped defects in epitaxial GaN layers

    Science.gov (United States)

    Weidlich, P. H.; Schnedler, M.; Eisele, H.; Dunin-Borkowski, R. E.; Ebert, Ph.

    2013-09-01

    The spatial distribution and the projected line directions of dislocations intersecting a cross-sectional (101¯0) cleavage plane of a GaN(0001) epitaxial layer is mapped using scanning tunneling microscopy. The data is correlated with the spatial positions of v-shaped defects. The dislocations are found to be bent away from the inclined semipolar facets of v-shaped defects, due to a strain-induced repulsive interaction. The dislocation distribution is characterized by agglomerations and intersecting bundles of dislocations with parallel projected line directions, stabilized by many body effects in the repulsive strain interactions.

  15. Efficient Exciton Diffusion and Resonance-Energy Transfer in Multi-Layered Organic Epitaxial Nanofibers

    DEFF Research Database (Denmark)

    Tavares, Luciana; Cadelano, Michele; Quochi, Francesco;

    2015-01-01

    Multi-layered epitaxial nanofibers are exemplary model systems for the study of exciton dynamics and lasing in organic materials due to their well-defined morphology, high luminescence efficiencies, and color tunability. We resort to temperature-dependent cw and picosecond photoluminescence (PL......-to-6T resonance-energy transfer efficiency, and the observed weak PL temperature dependence of the 6T acceptor material together result in an exceptionally high optical emission performance of this all-organic material system, thus making it well suited for example for organic light-emitting devices....

  16. Epitaxial TiN(001) wetting layer for growth of thin single-crystal Cu(001)

    Energy Technology Data Exchange (ETDEWEB)

    Chawla, J. S.; Zhang, X. Y.; Gall, D. [Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)

    2011-08-15

    Single-crystal Cu(001) layers, 4-1400 nm thick, were deposited on MgO(001) with and without a 2.5-nm-thick TiN(001) buffer layer. X-ray diffraction and reflection indicate that the TiN(001) surface suppresses Cu-dewetting, yielding a 4 x lower defect density and a 9 x smaller surface roughness than if grown on MgO(001) at 25 deg. C. In situ and low temperature electron transport measurements indicate that ultra-thin (4 nm) Cu(001) remains continuous and exhibits partial specular scattering at the Cu-vacuum boundary with a Fuchs-Sondheimer specularity parameter p = 0.6 {+-} 0.2, suggesting that the use of epitaxial wetting layers is a promising approach to create low-resistivity single-crystal Cu nanoelectronic interconnects.

  17. Photoluminescence characteristics of Pb-doped, molecular-beam-epitaxy grown ZnSe crystal layers

    International Nuclear Information System (INIS)

    The characteristic green photoluminescence emission and related phenomena in Pb-doped, molecular-beam-epitaxy (MBE)-grown ZnSe crystal layers were investigated to explore the nature of the center responsible for the green emission. The intensity of the green emission showed a distinct nonlinear dependence on excitation intensity. Pb-diffused polycrystalline ZnSe was similarly examined for comparison. The characteristic green emission has been observed only in MBE-grown ZnSe crystal layers with moderate Pb doping. The results of the investigations on the growth conditions, luminescence, and related properties of the ZnSe crystal layers suggest that the green emission is due to isolated Pb replacing Zn and surrounded with regular ZnSe lattice with a high perfection

  18. Arsenic-Doped High-Resistivity-Silicon Epitaxial Layers for Integrating Low-Capacitance Diodes

    Directory of Open Access Journals (Sweden)

    Jaber Derakhshandeh

    2011-12-01

    Full Text Available An arsenic doping technique for depositing up to 40-μm-thick high-resistivity layers is presented for fabricating diodes with low RC constants that can be integrated in closely-packed configurations. The doping of the as-grown epi-layers is controlled down to 5 × 1011 cm−3, a value that is solely limited by the cleanness of the epitaxial reactor chamber. To ensure such a low doping concentration, first an As-doped Si seed layer is grown with a concentration of 1016 to 1017 cm−3, after which the dopant gas arsine is turned off and a thick lightly-doped epi-layer is deposited. The final doping in the thick epi-layer relies on the segregation and incorporation of As from the seed layer, and it also depends on the final thickness of the layer, and the exact growth cycles. The obtained epi-layers exhibit a low density of stacking faults, an over-the-wafer doping uniformity of 3.6%, and a lifetime of generated carriers of more than 2.5 ms. Furthermore, the implementation of a segmented photodiode electron detector is demonstrated, featuring a 30 pF capacitance and a 90 Ω series resistance for a 7.6 mm2 anode area.

  19. Effect of atomic-arrangement matching on La{sub 2}O{sub 3}/Ge heterostructures for epitaxial high-k-gate-stacks

    Energy Technology Data Exchange (ETDEWEB)

    Kanashima, T., E-mail: kanashima@ee.es.osaka-u.ac.jp; Zenitaka, M.; Kajihara, Y.; Yamada, S.; Hamaya, K. [Graduate School of Engineering Science, Osaka University, Machkaneyama 1-3, Toyonaka, Osaka 560-8531 (Japan); Nohira, H. [Tokyo City University, 1-28-1 Tamazutumi, Setagaya-ku, Tokyo 158-8557 (Japan)

    2015-12-14

    We demonstrate a high-quality La{sub 2}O{sub 3} layer on germanium (Ge) as an epitaxial high-k-gate-insulator, where there is an atomic-arrangement matching condition between La{sub 2}O{sub 3}(001) and Ge(111). Structural analyses reveal that (001)-oriented La{sub 2}O{sub 3} layers were grown epitaxially only when we used Ge(111) despite low growth temperatures less than 300 °C. The permittivity (k) of the La{sub 2}O{sub 3} layer is roughly estimated to be ∼19 from capacitance-voltage (C-V) analyses in Au/La{sub 2}O{sub 3}/Ge structures after post-metallization-annealing treatments, although the C-V curve indicates the presence of carrier traps near the interface. By using X-ray photoelectron spectroscopy analyses, we find that only Ge–O–La bonds are formed at the interface, and the thickness of the equivalent interfacial Ge oxide layer is much smaller than that of GeO{sub 2} monolayer. We discuss a model of the interfacial structure between La{sub 2}O{sub 3} and Ge(111) and comment on the C-V characteristics.

  20. Visualization of deuterium dead layer by atom probe tomography

    KAUST Repository

    Gemma, Ryota

    2012-12-01

    The first direct observation, by atom probe tomography, of a deuterium dead layer is reported for Fe/V multilayered film loaded with D solute atoms. The thickness of the dead layers was measured to be 0.4-0.5 nm. The dead layers could be distinguished from chemically intermixed layers. The results suggest that the dead layer effect occurs even near the interface of the mixing layers, supporting an interpretation that the dead layer effect cannot be explained solely by electronic charge transfer but also involves a modulation of rigidity. © 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  1. Epitaxial strain induced atomic ordering in stoichiometric LaCoO3 thin films

    Science.gov (United States)

    Choi, Woo Seok; Kwon, Ji-Hwan; Jeen, Hyoungjeen; Sawatzky, George A.; Hinkov, Vladimir; Kim, Miyoung; Lee, Ho Nyung

    2015-03-01

    Heteroepitaxial strain imposed in complex transition metal oxide thin films is recognized as an effective tool for identifying and controlling emergent physical phenomena. Stoichiometric LaCoO3 is particularly interesting, since the thin film form of the material exhibits a robust macroscopic ferromagnetic ordering, while the bulk form of the material is a zero spin, nonmagnetic insulator. In this work, we show that the ferromagnetic ordering observed in LaCoO3 thin films is related to a lattice modulation in the atomic scale, originating from the epitaxial strain. The possibility of oxygen vacancies have been carefully ruled out using various macroscopic and microscopic spectroscopic techniques, and an unconventional strain relaxation behavior identified by strip-like lattice modulation pattern was responsible for the non-zero spin ground state of Co3+ ions. We further note that the unconventional strain relaxation did not involve any uncontrolled misfit dislocations.

  2. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Harada, Yukihiro, E-mail: y.harada@eedept.kobe-u.ac.jp; Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi [Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501 (Japan)

    2014-01-27

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  3. Atomic aspects in the epitaxial growth of metallic superlattices and nanostructures

    International Nuclear Information System (INIS)

    The properties of materials (mechanical, electronic, magnetic, etc) derive ultimately from the identity and spatial arrangement of their constituents. Nowadays, with the dimensions of technological devices and nanostructures reaching a few atomic constants, descriptions in terms of macroscopic concepts appear to be frequently inadequate and must give way to atomistic formulations based on elementary processes. Focusing on metallic materials, and more specifically on low-dimensional systems such as ultrathin films, superlattices or nanostructures, this paper reviews the atomic scale phenomena responsible for the most common types of defects (interfacial alloying, etching and roughness, formation of dislocations and pinholes, film discontinuities and twinning). It is shown that many of these features are related to the different mechanisms of strain relaxation in heteroepitaxial systems as well as to specific characteristics of atomic diffusion, such as the presence of Ehrlich-Schwoebel barriers hindering step crossings. Some special growth techniques (use of surfactants and codeposition) are also presented together with experimental examples demonstrating their usefulness to overcome the elements' natural limitations and produce accurately controlled, custom-designed epitaxial samples. Finally, a brief overview is given of different phenomena that can be exploited to produce self-assembled or self-organized structures. (topical review)

  4. Atomic Layer Thermopile Materials: Physics and Application

    Directory of Open Access Journals (Sweden)

    P. X. Zhang

    2008-01-01

    Full Text Available New types of thermoelectric materials characterized by highly anisotropic Fermi surfaces and thus anisotropic Seebeck coefficients are reviewed. Early studies revealed that there is an induced voltage in high TC oxide superconductors when the surface of the films is exposed to short light pulses. Subsequent investigations proved that the effect is due to anisotropic components of the Seebeck tensor, and the type of materials is referred to atomic layer thermopile (ALT. Our recent studies indicate that multilayer thin films at the nanoscale demonstrate enhanced ALT properties. This is in agreement with the prediction in seeking the larger figure of merit (ZT thermoelectric materials in nanostructures. The study of ALT materials provides both deep insight of anisotropic transport property of these materials and at the same time potential materials for applications, such as light detector and microcooler. By measuring the ALT properties under various perturbations, it is found that the information on anisotropic transport properties can be provided. The information sometimes is not easily obtained by other tools due to the nanoscale phase coexistence in these materials. Also, some remained open questions and future development in this research direction have been well discussed.

  5. Electronic properties of incommensurate atomic layers

    International Nuclear Information System (INIS)

    We present a brief theoretical overview of electronic properties of incommensurate multilayer systems, i.e., a pair of two-dimensional atomic layers stacked in an arbitrary orientation. We introduce the general theoretical scheme to describe the interlayer interaction between incommensurate crystal structures, and apply the formula to two specific examples, the twisted bilayer graphene and graphene–hBN composite bilayer. In each case, we calculate the electronic band structure and demonstrate that the low-energy electronic properties are significantly modified by the interlayer interaction, particularly when the two lattice structures are close to each other. We also study the energy spectrum and the quantum Hall effect in magnetic fields, where we see that the spectral structure exhibits a fractal nature, as known as the Hofstadter butterfly. We argue about the optical absorption properties of the twisted bilayer graphene and show that the interlayer interaction gives rise to the characteristic spectroscopic features in zero magnetic field and also in strong magnetic field. (author)

  6. Improving surface smoothness and photoluminescence of CdTe(1 1 1)A on Si(1 1 1) substrates grown by molecular beam epitaxy using Mn atoms

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Jyh-Shyang, E-mail: jswang@cycu.edu.tw [Department of Physics, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Center for Nano-Technology, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Tsai, Yu-Hsuan; Chen, Chang-Wei; Dai, Zi-Yuan; Tong, Shih-Chang [Department of Physics, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Yang, Chu-Shou [Graduate Institute of Electro-Optical Engineering, Tatung University, Taipei 10452, Taiwan (China); Wu, Chih-Hung [Institute of Nuclear Energy Research, Longtan 32546, Taiwan (China); Yuan, Chi-Tsu; Shen, Ji-Lin [Department of Physics, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Center for Nano-Technology, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China)

    2014-04-01

    Highlights: • CdTe(1 1 1)A epilayers were grown on Si(1 1 1) substrates by molecular beam epitaxy. • We report an enhanced growth using Mn atoms. • The significant improvements in surface quality and optical properties were found. - Abstract: This work demonstrates an improvement of the molecular beam epitaxial growth of CdTe(1 1 1)A epilayer on Si(1 1 1) substrates using Mn atoms. The reflection high-energy electron diffraction patterns show that the involvement of some Mn atoms in the growth of CdTe(1 1 1)A is even more effective than the use of a buffer layer with a smooth surface for forming good CdTe(1 1 1)A epilayers. 10 K Photoluminescence spectra show that the incorporation of only 2% Mn significantly reduced the intensity of defect-related emissions and considerably increased the integral intensity of exciton-related emissions by a large factor of about 400.

  7. Molecular beam epitaxial growth of tungsten layers embedded in single crystal gallium arsenide

    Energy Technology Data Exchange (ETDEWEB)

    Harbison, J.P.; Hwang, D.M.; Levkoff, J.; Derkits G.E. Jr.

    1985-12-01

    We have been able to fabricate structures which consist of a thin (approx.10 nm) polycrystalline W film embedded in surrounding single crystalline GaAs by molecular beam epitaxy (MBE) using an electron beam evaporation source to deposit W metal in an ultrahigh vacuum MBE growth chamber. The entire deposition sequence can take place at elevated temperature (625--700 /sup 0/C) due to the nonreactive nature of W with respect to GaAs. Reflective high-energy diffraction and transmission electron microscopy indicate that the single crystal GaAs overgrowth proceeds by seeding from the GaAs layer beneath the W through spontaneously occurring perforations in the W layer.

  8. Growth of Few-Layer Graphene on Sapphire Substrates by Directly Depositing Carbon Atoms

    Institute of Scientific and Technical Information of China (English)

    KANG Chao-Yang; TANG Jun; LIU Zhong-Liang; LI Li-Min; YAN Wen-Sheng; WEI Shi-Qiang; XU Peng-Shou

    2011-01-01

    Few-layer graphene (FLG) is successfully grown on sapphire substrates by directly depositing carbon atoms at the substrate temperature of 1300℃ in a molecular beam epitaxy chamber.The reflection high energy diffraction,Raman spectroscopy and near-edge x-ray absorption fine structure are used to characterize the sample,which confirm the formation of graphene layers.The mean domain size of FLG is around 29.2 nm and the layer number is about 2-3.The results demonstrate that the grown FLG displays a turbostratic stacking structure similar to that of the FLG produced by annealing C-terminated a-SiC surface.Graphene,a monolayer of sp2-bonded carbon atoms,is a quasi two-dimensional (2D) material.It has attracted great interest because of its distinctive band structure and physical properties.[1] Graphene can now be obtained by several different approaches including micromechanical[1] and chemical[2] exfoliation of graphite,epitaxial growth on hexagonal SiC substrates by Si sublimation in vacuum,[3] and CVD growth on metal substrates.[4] However,these preparation methods need special substrates,otherwise,in order to design microelectronic devices,the prepared graphene should be transferred to other appropriate substrates.Thus the growth of graphene on the suitable substrates is motivated.%Few-layer graphene (FLG) is successfully grown on sapphire substrates by directly depositing carbon atoms at the substrate temperature of 1300℃ in a molecular beam epitaxy chamber. The reflection high energy diffraction, Raman spectroscopy and near-edge x-ray absorption fine structure are used to characterize the sample, which confirm the formation of graphene layers. The mean domain size of FLG is around 29.2nm and the layer number is about 2-3. The results demonstrate that the grown FLG displays a turbostratic stacking structure similar to that of the FLG produced by annealing C-terminated α-SiC surface.

  9. Planarization and Processing of Metamorphic Buffer Layers Grown by Hydride Vapor-Phase Epitaxy

    Science.gov (United States)

    Zutter, Brian T.; Schulte, Kevin L.; Kim, Tae Wan; Mawst, Luke J.; Kuech, T. F.; Foran, Brendan; Sin, Yongkun

    2014-04-01

    Hydride vapor-phase epitaxy (HVPE) is a high-growth-rate, cost-effective means to grow epitaxial semiconductor material. Thick HVPE-based metamorphic buffer layers (MBLs) can serve as "pseudosubstrates" with controllable lattice parameter. In our structures, the indium content in In x Ga1- x As is gradually increased from zero to the final composition corresponding to the desired lattice constant, and then a thick (˜10 μm) constant-composition capping layer is grown. This thick capping layer promotes maximum strain relaxation while permitting use of polishing procedures to achieve surface planarity. Lattice-mismatched growth of MBLs invariably results in rough, cross-hatched surface morphology exhibiting up to 200 nm peak-to-valley roughness. This roughness can be eliminated by chemical mechanical planarization, thus creating a suitable surface for subsequent regrowth. Polishing of In x Ga1- x As is complicated by the sensitivity of the surface layer to the polishing parameters, particularly the applied pressure. Polishing at high applied pressure (12 psi) results in the formation of circular asperities hundreds of nanometers high and tens of microns in diameter. When lower applied pressure (4 psi) was used, the cross-hatching height of MBLs was lowered from 200 nm to <10 nm over a 350 μm lateral scale. The successfully planarized In0.20Ga0.80As MBLs were used as a substrate for a superlattice (SL) structure such as that used in quantum cascade lasers. Use of planarization before regrowth of the SL resulted in a reduction of the high-resolution x-ray diffraction peak full-width at half-maximum from 389″ to 159″.

  10. Characteristics of the epitaxy of InGaN-based light-emitting diodes grown by nanoscale epitaxial lateral overgrowth using a nitrided titanium buffer layer

    International Nuclear Information System (INIS)

    In this work, a buffer layer of nitrided titanium (Ti) achieved through the nitridation of a Ti metal layer on a sapphire substrate was used for the epitaxial growth of InGaN-based light-emitting diodes (LEDs) achieved by low pressure metal-organic chemical vapor deposition. The effect of in-situ Ti metal nitridation on the performance of these InGaN-based LEDs was then investigated. It was very clear that the use of the nitrided Ti buffer layer (NTBL) induced the formation of a nanoscale epitaxial lateral overgrowth layer during the epitaxial growth. When evaluated by Raman spectroscopy, this epi-layer exhibited large in-plane compressive stress releasing with a Raman shift value of 567.9 cm-1. Cathodoluminescence spectroscopy and transmission electron microscopy results indicated that the InGaN-based LEDs with an NTBL have improved crystal quality, with a low threading dislocations density being yielded via the strain relaxation in the InGaN-based LEDs. Based on the results mentioned above, the electroluminescence results indicate that the light performance of InGaN-based LEDs with an NTBL can be enhanced by 45% and 42% at 20 mA and 100 mA, respectively. These results suggest that the strain relaxation and quality improvement in the GaN epilayer could be responsible for the enhancement of emission power. - Highlights: • The crystal-quality of InGaN-based LEDs with NTBL by NELOG was improved. • The InGaN-based LEDs with NTBL have strain releases by NELOG. • The optical properties of InGaN-based LEDs were shown by CL and EL measurements

  11. Epitaxial and polycrystalline CuInS2 layers: Structural metastability and its influence on the photoluminescence

    International Nuclear Information System (INIS)

    Thin epitaxial and polycrystalline CuInS2 (CIS) films were grown on single crystalline Si(111) and Mo-coated Si substrates, respectively, by means of molecular beam epitaxy from elemental sources. Photoluminescence (PL) measurements were performed to investigate the optical properties of both, epitaxial and polycrystalline CIS films. Epitaxial CIS samples show defect related transitions only and the PL spectra are dominated by broad luminescence peaks of deep levels, while excitonic transitions are completely absent. This contrasts sharply with the PL of the polycrystalline films, which is dominated by excitonic luminescence. Contributions due to shallow defects are observed with a small intensity only. However, luminescence peaks of defects with electronic levels deep in the band gap are not present at all. This includes the broad PL lines around 1.2 or 1.3 eV which are typical for polycrystalline CIS solar-cell material. X-ray diffraction and selected area electron diffraction measurements were employed in order to study the crystal structure. The epitaxial CIS films show a coexistence of the metastable CuAu-type (CA) ordering with the ground-state chalcopyrite (CH) structure, while the polycrystalline layers crystallize exclusively in the ground-state CH ordering. Hence, the coexistence of the metastable CA ordering and the ground-state CH structure in the epitaxial films is accompanied by a high density of electrically active intrinsic defects with levels deep in the band gap

  12. Characterization of GaN Buffer Layers and Its Epitaxial Layers Grown by MOCVD

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    Low-pressure MOCVD has been used to investigate the properties of low-temperature buffer layer deposition conditions and their influence on the properties of high-temperature GaN epilayers grown subsequently. It is found that the surface morphology of the as-grown buffer layer after thermal annealing at 1030℃ and 1050℃ depends strongly on the thickness of the buffer layer. In particular when a thick buffer layer is used, large trapezoidal nuclei are formed after annealing.

  13. Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Balaji, M. [Science et Ingenierie des Materiaux et des Procedes, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Heres (France); ACERDE, 452 rue des sources, 38920 Crolles (France); Crystal Growth Centre, Anna University-Chennai, Chennai 600025 (India); Claudel, A. [ACERDE, 452 rue des sources, 38920 Crolles (France); Fellmann, V. [Science et Ingenierie des Materiaux et des Procedes, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Heres (France); Gelard, I. [ACERDE, 452 rue des sources, 38920 Crolles (France); Blanquet, E., E-mail: elisabeth.blanquet@simap.grenoble-inp.fr [Science et Ingenierie des Materiaux et des Procedes, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Heres (France); Boichot, R. [Science et Ingenierie des Materiaux et des Procedes, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Heres (France); Pierret, A. [Departement de Mesures Physiques, ONERA, Chemin de la Huniere, 91761 Palaiseau Cedex (France); CEA-CNRS Group ' NanoPhysique et SemiConducteurs' , INAC/SP2M/NPSC, CEA-Grenoble, 17 rue des Martyrs, 38054 Grenoble, Cedex 9 (France); and others

    2012-06-15

    Highlights: Black-Right-Pointing-Pointer Growth of AlN Nucleation layers and its effect on high temperature AlN films quality were investigated. Black-Right-Pointing-Pointer AlN nucleation layers stabilizes the epitaxial growth of AlN and improves the surface morphology of AlN films. Black-Right-Pointing-Pointer Increasing growth temperature of AlN NLs as well as AlN films improves the structural quality and limits the formation of cracks. - Abstract: AlN layers were grown on c-plane sapphire substrates with AlN nucleation layers (NLs) using high temperature hydride vapor phase epitaxy (HT-HVPE). Insertion of low temperature NLs, as those typically used in MOVPE process, prior to the high temperature AlN (HT-AlN) layers has been investigated. The NLs surface morphology was studied by atomic force microscopy (AFM) and NLs thickness was measured by X-ray reflectivity. Increasing nucleation layer deposition temperature from 650 to 850 Degree-Sign C has been found to promote the growth of c-oriented epitaxial HT-AlN layers instead of polycrystalline layers. The growth of polycrystalline layers has been related to the formation of dis-oriented crystallites. The density of such disoriented crystallites has been found to decrease while increasing NLs deposition temperature. The HT-AlN layers have been characterized by X-ray diffraction {theta} - 2{theta} scan and (0 0 0 2) rocking curve measurement, Raman and photoluminescence spectroscopies, AFM and field emission scanning electron microscopy. Increasing the growth temperature of HT-AlN layers from 1200 to 1400 Degree-Sign C using a NL grown at 850 Degree-Sign C improves the structural quality as well as the surface morphology. As a matter of fact, full-width at half-maximum (FWHM) of 0 0 0 2 reflections was improved from 1900 to 864 arcsec for 1200 Degree-Sign C and 1400 Degree-Sign C, respectively. Related RMS roughness also found to decrease from 10 to 5.6 nm.

  14. Metalorganic vapor phase epitaxy of GaAs on Si using II a-flouride buffer layers

    Science.gov (United States)

    Tiwari, A. N.; Freundlich, A.; Beaumont, B.; Blunier, S.; Zogg, H.; Teodoropol, S.; Vèrié, C.

    1992-11-01

    Metalorganic vapor phase epitaxy has been used for the first time to grow epitaxial GaAs layers on (111) and (100) oriented Si either using CaF 2 or stacked (Ca,Sr)F 2/CaF 2 as a buffer. The GaAs layers show sharp and well resolved electron channeling patterns. The Rutherford backscattering (RBS) ion channeling minimum yield is 5% for (111) orientation and 6% for (100) orientation. The GaAs(111) layers are untwinned. The strain in the GaAs layer has been measured with RBS and X-ray diffraction and it is found that the thermal mismatch-induced strain in the GaAs layer is considerably lower than in similar GaAs films grown without flouride buffer.

  15. Controlled Growth of Non-Uniform Arsenic Profiles in Silicon Reduced-Pressure Chemical Vapor Deposition Epitaxial Layers

    NARCIS (Netherlands)

    Popadic, M.; Scholtes, T.L.M.; De Boer, W.; Sarubbi, F.; Nanver, L.K.

    2009-01-01

    An empirical model of As surface segregation during reduced-pressure chemical vapor deposition Si epitaxy is presented. This segregation mechanism determines the resulting doping profile in the grown layer and is here described by a model of simultaneous and independent As adsorption and segregation

  16. USE OF ATOMIC LAYER DEPOSITION OF FUNCTIONALIZATION OF NANOPOROUS BIOMATERIALS

    Energy Technology Data Exchange (ETDEWEB)

    Brigmon, R.; Narayan, R.; Adiga, S.; Pellin, M.; Curtiss, L.; Stafslien, S.; Chisholm, B.; Monteiro-Riviere, N.; Elam, J.

    2010-02-08

    Due to its chemical stability, uniform pore size, and high pore density, nanoporous alumina is being investigated for use in biosensing, drug delivery, hemodialysis, and other medical applications. In recent work, we have examined the use of atomic layer deposition for coating the surfaces of nanoporous alumina membranes. Zinc oxide coatings were deposited on nanoporous alumina membranes using atomic layer deposition. The zinc oxide-coated nanoporous alumina membranes demonstrated antimicrobial activity against Escherichia coli and Staphylococcus aureus bacteria. These results suggest that atomic layer deposition is an attractive technique for modifying the surfaces of nanoporous alumina membranes and other nanostructured biomaterials.

  17. Fe-doped InN layers grown by molecular beam epitaxy

    International Nuclear Information System (INIS)

    Iron(Fe)-doped InN (InN:Fe) layers have been grown by molecular beam epitaxy. It is found that Fe-doping leads to drastic increase of residual electron concentration, which is different from the semi-insulating property of Fe-doped GaN. However, this heavy n-type doping cannot be fully explained by doped Fe-concentration ([Fe]). Further analysis shows that more unintentionally doped impurities such as hydrogen and oxygen are incorporated with increasing [Fe] and the surface is degraded with high density pits, which probably are the main reasons for electron generation and mobility reduction. Photoluminescence of InN is gradually quenched by Fe-doping. This work shows that Fe-doping is one of good choices to control electron density in InN.

  18. Temperature Dependence of 1/f Noise in Gallium Nitride Epitaxial Layer

    Directory of Open Access Journals (Sweden)

    Ashutosh Kumar

    2011-01-01

    Full Text Available 1/f noise investigation was performed on n-GaN epitaxial layer grown on sapphire. The variation of spectral power density of voltage fluctuations density was observed as a function of frequency (100-50 Hz and it showed the 1/f spectra. This type of behavior was attributed to the presence of traps. The variation in spectral power density of voltage fluctuations with temperature was also observed with in the temperature range 80 K and 300 K and it was found to be slightly increasing with temperature. It was attributed to the trapping-detrapping process of charge carriers by the defects. Four probe configuration was used for noise measurement and contacts were made with indium. To check the stability and ohmic behavior of contacts, I-V measurements were performed with in the temperature range 80-325 K.

  19. Quantitative analysis of HOLZ line splitting in CBED patterns of epitaxially strained layers

    Energy Technology Data Exchange (ETDEWEB)

    Houdellier, F. [Centre d' Elaboration de Materiaux et d' Etudes Structurales, C.N.R.S., 29, Rue Jeanne Marvig, BP 94347 31055 Toulouse Cedex 4 (France)]. E-mail: florent@cemes.fr; Roucau, C. [Centre d' Elaboration de Materiaux et d' Etudes Structurales, C.N.R.S., 29, Rue Jeanne Marvig, BP 94347 31055 Toulouse Cedex 4 (France); Clement, L. [CEA, Departement de Recherche Fondamentale sur la Matiere Condensee, SP2M, 17, Rue des Martyrs, 38054 Grenoble (France); Rouviere, J.L. [CEA, Departement de Recherche Fondamentale sur la Matiere Condensee, SP2M, 17, Rue des Martyrs, 38054 Grenoble (France); Casanove, M.J. [Centre d' Elaboration de Materiaux et d' Etudes Structurales, C.N.R.S., 29, Rue Jeanne Marvig, BP 94347 31055 Toulouse Cedex 4 (France)

    2006-08-15

    A SiGe layer epitaxially grown on a silicon substrate is experimentally studied by convergent beam electron diffraction (CBED) experiments and used as a test sample to analyse the higher-order Laue zones (HOLZ) line splitting. The influence of surface strain relaxation on the broadening of HOLZ lines is confirmed. The quantitative fit of the observed HOLZ line profiles is successfully achieved using a formalism particularly well-adapted to the case of a z-dependent crystal potential (z being the zone axis). This formalism, based on a time-dependent perturbation theory approach, proves to be much more efficient than a classical Howie-Whelan approach, to reproduce the complex HOLZ lines profile in this heavily strained test sample.

  20. Growth of ZnO(0001) on GaN(0001)/4H-SiC buffer layers by plasma-assisted hybrid molecular beam epitaxy

    Science.gov (United States)

    Adolph, David; Tingberg, Tobias; Ive, Tommy

    2015-09-01

    Plasma-assisted molecular beam epitaxy was used to grow ZnO(0001) layers on GaN(0001)/4H-SiC buffer layers deposited in the same growth chamber equipped with both N- and O-plasma sources. The GaN buffer layers were grown immediately before initiating the growth of ZnO. Using a substrate temperature of 445 °C and an O2 flow rate of 2.5 standard cubic centimeters per minute, we obtained ZnO layers with statistically smooth surfaces having a root-mean-square roughness of 0.3 nm and a peak-to-valley distance of 3 nm as revealed by atomic force microscopy. The full-width-at-half-maximum for x-ray rocking curves obtained across the ZnO(0002) and ZnO(10 1 bar 5) reflections was 198 and 948 arcsec, respectively. These values indicated that the mosaicity of the ZnO layer was comparable to the corresponding values of the underlying GaN buffer layer. Reciprocal space maps showed that the in-plane relaxation of the GaN and ZnO layers was 82% and 73%, respectively, and that the relaxation occurred abruptly during the growth. Room-temperature Hall-effect measurements revealed that the layers were inherently n-type and had an electron concentration of 1×1019 cm-3 and a Hall mobility of 51 cm2/V s.

  1. Temperature dependence of photoluminescence from ordered GaInP{sub 2} epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Prutskij, T. [Instituto de Ciencias, BUAP, Apartado Postal 207, 72000 Puebla, Pue. (Mexico); Pelosi, C. [IMEM/CNR, Parco Area delle Scienze 37/A, 43010 Parma (Italy)

    2010-01-15

    The temperature behavior of the integrated intensity of photoluminescence (PL) emission from ordered GaInP{sub 2} epitaxial layer was measured at temperatures of 10 - 300 K. Within this temperature range the PL emission is dominated by band-to-band radiative recombination. The PL intensity temperature dependence has two regions: at low temperatures it quenches rapidly as the temperature increases, and above 100 K it reduces slowly. This temperature behavior is compared with that of disordered GaInP{sub 2} layer. The specter of the PL emission of the disordered layer has two peaks, which are identified as due to donor-accepter (D-A) and band-to-band recombination. The PL intensity quenching of these spectral bands is very different: With increasing temperature, the D-A peak intensity remains almost unchanged at low temperatures and then decreases at a higher rate. The intensity of the band-to-band recombination peak decays gradually, having a higher rate at low temperatures than at higher temperatures. Comparing these temperature dependencies of these PL peaks of ordered and disordered alloys and the temperature behavior of their full width at half maximum (FWHM), we conclude that the different morphology of these alloys causes their different temperature behavior. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  2. Epitaxial-strain-induced polar-to-nonpolar transitions in layered oxides

    Science.gov (United States)

    Lu, Xue-Zeng; Rondinelli, James M.

    2016-09-01

    Epitaxial strain can induce collective phenomena and new functionalities in complex oxide thin films. Strong coupling between strain and polar lattice modes can stabilize new ferroelectric phases from nonpolar dielectrics or enhance electric polarizations and Curie temperatures. Recently, strain has also been exploited to induce novel metal-insulator transitions and magnetic reconstructions through its coupling to nonpolar modes, including rotations of BO6 transition-metal octahedra. Although large strains are thought to induce ferroelectricity, here we demonstrate a polar-to-nonpolar transition in (001) films of layered A3B2O7 hybrid-improper ferroelectrics with experimentally accessible biaxial strains. We show the origin of the transition originates from the interplay of trilinear-related lattice mode interactions active in the layered oxides, and those interactions are directly strain tunable. Our results call for a careful re-examination of the role of strain-polarization coupling in ferroelectric films with nontrivial anharmonicities and offer a route to search for new functionalities in layered oxides.

  3. Atomic layer deposition of high-k oxides on graphene

    OpenAIRE

    Alles, Harry; Aarik, Jaan; Kozlova, Jekaterina; Niilisk, Ahti; Rammula, Raul; Sammelselg, Väino

    2011-01-01

    Comment: Graphene - Synthesis, Characterization, Properties and Applications, Jian Ru Gong (Ed.), ISBN: 978-953-307-292-0, InTech, Available from: http://www.intechopen.com/articles/show/title/atomic-layer-deposition-of-high-k-oxides-on-graphene

  4. Epitaxial growth of single-crystal C sub 60 on mica by helium-atom scattering

    Energy Technology Data Exchange (ETDEWEB)

    Schmicker, D.; Schmidt, S. (Max-Planck-Institut fuer Stroemungsforschung, Bunsenstrasse 10, W-3400 Goettingen (Germany)); Skofronick, J.G. (Department of Physics, Florida State University, Tallahassee, Florida 32306 (United States)); Toennies, J.P.; Vollmer, R. (Max-Planck-Institut fuer Stroemungsforschung, Bunsenstrasse 10, W-3400 Goettingen (Germany))

    1991-11-15

    We report on a helium-atom-scattering study of the growth, structure, and surface dynamics of a very thin film of C{sub 60} sublimed in ultrahigh vacuum onto a freshly cleaved mica substrate. The resulting diffraction pattern showed that the C{sub 60} forms a hexagonal crystal layer that is in registry with the mica substrate and at a spacing of 10.4 A. The dispersion results showed two Einstein modes.

  5. Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

    Science.gov (United States)

    Karim, Marwa; Martini, Roberto; Radhakrishnan, Hariharsudan Sivaramakrishnan; van Nieuwenhuysen, Kris; Depauw, Valerie; Ramadan, Wedgan; Gordon, Ivan; Poortmans, Jef

    2014-07-01

    Sintered porous silicon is a well-known seed for homo-epitaxy that enables fabricating transferrable monocrystalline foils. The crystalline quality of these foils depends on the surface roughness and the strain of this porous seed, which should both be minimized. In order to provide guidelines for an optimum foil growth, we present a systematic investigation of the impact of the thickness of this seed and of its sintering time prior to epitaxial growth on strain and surface roughness. Strain and surface roughness were monitored in monolayers and double layers with different porosities as a function of seed thickness and of sintering time by high-resolution X-ray diffraction and profilometry, respectively. Unexpectedly, we found that strain in double and monolayers evolves in opposite ways with respect to layer thickness. This suggests that an interaction between layers in multiple stacks is to be considered. We also found that if higher seed thickness and longer annealing time are to be preferred to minimize the strain in double layers, the opposite is required to achieve smoother layers. The impact of these two parameters may be explained by considering the morphological evolution of the pores upon sintering and, in particular, the disappearance of interconnections between the porous seed and the bulk as well as the enlargement of pores near the surface. An optimum epitaxial growth hence calls for a trade-off in seed thickness and annealing time, between minimum-strained layers and rougher surfaces.

  6. Interfacial Atomic Structure of Twisted Few-Layer Graphene

    OpenAIRE

    Ryo Ishikawa; Nathan R. Lugg; Kazutoshi Inoue; Hidetaka Sawada; Takashi Taniguchi; Naoya Shibata; Yuichi Ikuhara

    2016-01-01

    A twist in bi- or few-layer graphene breaks the local symmetry, introducing a number of intriguing physical properties such as opening new bandgaps. Therefore, determining the twisted atomic structure is critical to understanding and controlling the functional properties of graphene. Combining low-angle annular dark-field electron microscopy with image simulations, we directly determine the atomic structure of twisted few-layer graphene in terms of a moiré superstructure which is parameterize...

  7. The Structural Quality of AlxGa1-xN Epitaxial Layers Grown by Digitally-AlloyedModulated Precursor Epitaxy Determined by Transmission Electron Microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Hawkridge, Michael E; Liliental-Weber, Zuzanna; Kim, Hee Jin; Choi, Suk; Yoo, Dongwon; Ryou, Jae-Hyun; Dupuis, Russell

    2008-10-13

    Al(x)Ga(1-x)N layers of varying composition (0.5epitaxial regime employing AlN and GaN binary sub-layers by metalorganic chemical vapor deposition on AlN templates were characterized by transmission electron microscopy techniques. Fine lamellae were observed in bright field images that indicate a possible variation in composition due to the modulated nature of growth. In higher Ga content samples (x(Al)<0.75), a compositional inhomogeniety associated with thicker island regions was observed, which is determined to be due to large Ga-rich areas formed at the base of the layer. Possible causes for the separation of Ga-rich material are discussed in the context of the growth regime used.

  8. Nucleation and coalescence behavior for epitaxial ZnO layers on ZnO/sapphire templates grown by halide vapor phase epitaxy

    Science.gov (United States)

    Fujii, Tetsuo; Yoshii, Naoki; Masuda, Rui; Tanabe, Tetsuhiro; Kamisawa, Akira; Hosaka, Shigetoshi; Kumagai, Yoshinao; Koukitu, Akinori

    2009-02-01

    The effects of growth conditions for ZnO layers grown by halide vapor phase epitaxy (HVPE) on (0 0 0 1) ZnO/sapphire templates are investigated. Micron-sized pyramidal ZnO islands nucleate on the template at the initial growth stage and each island grows differently with the process conditions. The high temperature of 1000 °C promotes a lateral growth rate and coalescence between the islands. The full-width at half-maximums (FWHMs) of X-ray rocking curves for the (0 0 0 2) and (1 0 1¯ 1) planes from a fully coalesced ZnO layer are quite narrow values below 160 arcsec. Transmission electron microscopy (TEM) reveals that screw character dislocations in the template do not propagate into the HVPE-grown layer.

  9. Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth

    Science.gov (United States)

    Podkaminer, J. P.; Patzner, J. J.; Davidson, B. A.; Eom, C. B.

    2016-08-01

    Sputter deposition is a widely used growth technique for a large range of important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to an industrial scale. This tunable kinematic deposition process excels in easily adapting for a large range of environments and growth procedures. Despite the vast advantages, there is a significant lack of in situ analysis options during sputtering. In particular, the area of real time atomic layer control is severely deficient. Atomic layer controlled growth of epitaxial thin films and artificially layered superlattices is critical for both understanding their emergent phenomena and engineering novel material systems and devices. Reflection high-energy electron diffraction (RHEED) is one of the most common in situ analysis techniques during thin film deposition that is rarely used during sputtering due to the effect of the strong permanent magnets in magnetron sputter sources on the RHEED electron beam. In this work we have solved this problem and designed a novel way to deter the effect of the magnets for a wide range of growth geometries and demonstrate the ability for the first time to have layer-by-layer control during sputter deposition by in situ RHEED.

  10. Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth

    Directory of Open Access Journals (Sweden)

    J. P. Podkaminer

    2016-08-01

    Full Text Available Sputter deposition is a widely used growth technique for a large range of important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to an industrial scale. This tunable kinematic deposition process excels in easily adapting for a large range of environments and growth procedures. Despite the vast advantages, there is a significant lack of in situ analysis options during sputtering. In particular, the area of real time atomic layer control is severely deficient. Atomic layer controlled growth of epitaxial thin films and artificially layered superlattices is critical for both understanding their emergent phenomena and engineering novel material systems and devices. Reflection high-energy electron diffraction (RHEED is one of the most common in situ analysis techniques during thin film deposition that is rarely used during sputtering due to the effect of the strong permanent magnets in magnetron sputter sources on the RHEED electron beam. In this work we have solved this problem and designed a novel way to deter the effect of the magnets for a wide range of growth geometries and demonstrate the ability for the first time to have layer-by-layer control during sputter deposition by in situ RHEED.

  11. Atomically-Smooth MgO films grown on Epitaxial Graphene by Pulsed Laser Deposition

    Science.gov (United States)

    Stuart, Sean; Sandin, Andreas; Rowe, Jack; Dougherty, Dan; Ulrich, Marc

    2013-03-01

    The growth of high quality insulating films on graphene is a crucial materials science task for graphene electronic and spintronic applications. It has been demonstrated that direct spin injection from a magnetic electrode to graphene is possible using MgO tunnel barriers of sufficient quality. We have used pulsed laser deposition (PLD) to grow thin magnesium oxide films directly on epitaxial graphene on SiC(0001). We observe very smooth film morphologies (typical rms roughness of ~ 0.4 nm) that are nearly independent of film thickness and conform to the substrate surface which had ~ 0.2 nm rms roughness. Surface roughness of 0.04 nm have been recorded for ~ 1nm films with no pinholes seen by AFM. XPS and XRD data show non crystalline, hydroxylated MgO films with uniform coverage. This work shows that PLD is a good technique to produce graphene-oxide interfaces without pre-deposition of an adhesion layer or graphene functionalization. The details and kinetics of the deposition process will be described with comparisons being made to other dielectric-on-graphene deposition approaches. Funded by ARO Staff Research Contract # W911NF.

  12. Drastic Minimization in the van der Waals Interaction with the Bottom Epitaxial Graphene Layer by the Diels-Alder Surface Chemistry of the Top Graphene Layer

    OpenAIRE

    Sarkar, Santanu

    2014-01-01

    The Diels-Alder surface modified top epitaxial graphene layer, with newly created pair of sp3 carbon centres, results in abrupt minimization of interlayer van der Waals interactions between two stacked graphene planes, and escapes the wafer during post-reaction manipulation stage, leaving the layer under it almost pristine-like. Above picture shows Diels-Alder functionalized sp2/sp3 graphene adduct leaves the parent wafer. In this communication we systematically address several fundamental qu...

  13. Epitaxial growth of atomically flat gadolinia-doped ceria thin films by pulsed laser deposition

    DEFF Research Database (Denmark)

    Chen, Yunzhong; Pryds, Nini; Schou, Jørgen;

    preparation of ultrathin seed layers in the first stage of the deposition process is often envisaged to control the growth and physical properties of the subsequent coating. This work suggests that the limitations of conventional pulsed laser deposition (PLD), performed at moderate temperature (400°C), to the......10 layers with a thickness of 4 nm, 13 nm and 22 nm, respectively, grown on Mg(100), were studied by atomic force microscopy and X-ray reflectometry....... growth of dense, gas impermeable 10 mol% gadolinia-doped ceria (CGO10) solid electrolyte can be overcome by the seeding process. In order to evaluate the seed layer preparation, the effects of different thermal annealing treatments on the morphology, microstructure and surface roughness of ultrathin CGO...

  14. Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications

    International Nuclear Information System (INIS)

    Atomic layer deposition (ALD), also referred to as atomic layer epitaxy (ALE), was originally developed to process thin film electroluminescent structures for flat panel displays, which include as core components also insulating oxide layers such as alumina and aluminium titanium oxide. Another early application of oxide ALD was the processing of overlayers for catalysts. More recently, a major breakthrough for the ALD technology is the use of oxide thin films in microelectronics as gate and dynamic random access memory capacitor dielectrics. Besides giving a brief introduction to the ALD/ALE technology, the paper will address the present status of depositing binary and more complex (i.e. perovskite-type) metal oxides emphasizing precursor chemistry. (author)

  15. Fabrication and properties of epitaxial buffer layers on nonmagnetic textured Ni based alloy substrates

    International Nuclear Information System (INIS)

    Biaxially aligned YBCO thick films on oxide buffered metallic substrates is a promising route toward the fabrication of superconducting tapes operating at liquid nitrogen temperature. The role of buffer layer is to reduce the lattice mismatch between the substrate and the YBCO film, to adapt the thermal expansion coefficient, to hamper the diffusion of Ni in YBCO film and to prevent the oxidation of the metallic substrate surface. This paper presents a study regarding CeO2 buffer layer deposition on a new nonmagnetic (001)[100] textured Ni-V alloy substrates. The deposition of CeO2 was performed by both pulsed laser ablation and e-beam evaporation techniques. The θ-2θ X-ray diffraction pattern mainly exhibits the (00 ell) peaks of CeO2, indicating that the films are epitaxially grown with the c axis perpendicular to the substrate. Rocking curves through the CeO2 (002) peak have a FWHM of about 6 degree. The SEM studies have shown that the surface is smooth, continuous and free of cracks. Texture analysis reveals a good in-plane orientation for the ablated CeO2 film, whereas the electron beam evaporated CeO2 shows two textures in the growth plane. Further efforts are focused on the deposition of YBCO thick film on the as buffered nonmagnetic metallic substrate

  16. The effect of atomic structure on interface spin-polarization of half-metallic spin valves: Co2MnSi/Ag epitaxial interfaces

    International Nuclear Information System (INIS)

    Using density functional theory calculations motivated by aberration-corrected electron microscopy, we show how the atomic structure of a fully epitaxial Co2MnSi/Ag interfaces controls the local spin-polarization. The calculations show clear difference in spin-polarization at Fermi level between the two main types: bulk-like terminated Co/Ag and Mn-Si/Ag interfaces. Co/Ag interface spin-polarization switches sign from positive to negative, while in the case of Mn-Si/Ag, it is still positive but reduced. Cross-sectional atomic structure analysis of Co2MnSi/Ag interface, part of a spin-valve device, shows that the interface is determined by an additional layer of either Co or Mn. The presence of an additional Mn layer induces weak inverse spin-polarisation (−7%), while additional Co layer makes the interface region strongly inversely spin-polarized (−73%). In addition, we show that Ag diffusion from the spacer into the Co2MnSi electrode does not have a significant effect on the overall Co2MnSi /Ag performance

  17. Analysis of the Band-Structure in (Ga, MnAs Epitaxial Layers by Optical Methods

    Directory of Open Access Journals (Sweden)

    O. Yastrubchak

    2012-03-01

    Full Text Available The ternary III-V semiconductor (Ga, MnAs has recently drawn a lot of attention as the model diluted ferromagnetic semiconductor, combining semiconducting properties with magnetism. (Ga, MnAs layers are usually gown by the low-temperature molecular-beam epitaxy (LT-MBE technique. Below a magnetic transition temperature, TC, substitutional Mn2+ ions are ferromagnetically ordered owing to interaction with spin-polarized holes. However, the character of electronic states near the Fermi energy and the electronic structure in ferromagnetic (Ga, MnAs are still a matter of controversy. The photoreflectance (PR spectroscopy was applied to study the band-structure evolution in (Ga, MnAs layers with increasing Mn content. We have investigated thick (800-700 nm and 230-300 nm (Ga, MnAs layers with Mn content in the wide range from 0.001 % to 6 % and, as a reference, undoped GaAs layer, grown by LT-MBE on semi-insulating (001 GaAs substrates. Our findings were interpreted in terms of the model, which assumes that the mobile holes residing in the valence band of ferromagnetic (Ga, MnAs and the Fermi level position determined by the concentration of valence-band holes. The ternary III-V semiconductor (Ga, MnAs has recently drawn a lot of attention as the model diluted ferromagnetic semiconductor, combining semiconducting properties with magnetism. (Ga, MnAs layers are usually gown by the low-temperature molecular-beam epitaxy (LT-MBE technique. Below a magnetic transition temperature, TC, substitutional Mn2+ ions are ferromagnetically ordered owing to interaction with spin-polarized holes. However, the character of electronic states near the Fermi energy and the electronic structure in ferromagnetic (Ga, MnAs are still a matter of controversy. The photoreflectance (PR spectroscopy was applied to study the band-structure evolution in (Ga, MnAs layers with increasing Mn content. We have investigated thick (800-700 nm and 230-300 nm (Ga

  18. Spin transport in epitaxial magnetic manganite/ruthenate heterostructures with an LaMnO{sub 3} layer

    Energy Technology Data Exchange (ETDEWEB)

    Petrzhik, A. M., E-mail: petrzhik@hitech.cplire.ru; Ovsyannikov, G. A.; Shadrin, A. V. [Russian Academy of Sciences, Kotel’nikov Institute of Radio Engineering and Electronics (Russian Federation); Khaidukov, Yu. N.; Mustafa, L. [Max-Plank Institute for Solid State Research (Germany)

    2014-12-15

    Epitaxial La{sub 0.7}Sr{sub 0.3}MnO{sub 3}/LaMnO{sub 3}/SrRuO{sub 3} (LSMO/LMO/SRO) heterostructures with an LMO layer 0–35 nm thick are grown by laser ablation on an NdGaO{sub 3} substrate at a high temperature. X-ray diffraction and transmission electron microscopy demonstrate sharp interfaces and epitaxial growth of the LSMO and SRO layers in the heterostructures at an LMO layer thickness of 0–35 nm. SQUID measurements of the magnetic moment of the heterostructures with an LMO layer and the data obtained with reflectometry of polarized neutrons show that the manganite LMO layer is a ferromagnet at a temperature below 150 K and strongly affects the magnetic moment of the heterostructures at low temperatures. The magnetoresistance of the mesostructure created from the heterostructure using lithography and ion etching decreases with increasing LMO layer thickness and weakly depends on the direction of an applied magnetic field. If the LMP layer is absent, a negative magnetoresistance is detected; it is likely to be caused by a negative magnetization of the SRO layer.

  19. Layer-Controlled Chemical Vapor Deposition Growth of MoS2 Vertical Heterostructures via van der Waals Epitaxy.

    Science.gov (United States)

    Samad, Leith; Bladow, Sage M; Ding, Qi; Zhuo, Junqiao; Jacobberger, Robert M; Arnold, Michael S; Jin, Song

    2016-07-26

    The fascinating semiconducting and optical properties of monolayer and few-layer transition metal dichalcogenides, as exemplified by MoS2, have made them promising candidates for optoelectronic applications. Controllable growth of heterostructures based on these layered materials is critical for their successful device applications. Here, we report a direct low temperature chemical vapor deposition (CVD) synthesis of MoS2 monolayer/multilayer vertical heterostructures with layer-controlled growth on a variety of layered materials (SnS2, TaS2, and graphene) via van der Waals epitaxy. Through precise control of the partial pressures of the MoCl5 and elemental sulfur precursors, reaction temperatures, and careful tracking of the ambient humidity, we have successfully and reproducibly grown MoS2 vertical heterostructures from 1 to 6 layers over a large area. The monolayer MoS2 heterostructure was verified using cross-sectional high resolution transmission electron microscopy (HRTEM) while Raman and photoluminescence spectroscopy confirmed the layer-controlled MoS2 growth and heterostructure electronic interactions. Raman, photoluminescence, and energy dispersive X-ray spectroscopy (EDS) mappings verified the uniform coverage of the MoS2 layers. This reaction provides an ideal method for the scalable layer-controlled growth of transition metal dichalcogenide heterostructures via van der Waals epitaxy for a variety of optoelectronic applications.

  20. Exposure of epitaxial graphene on SiC(0001) to atomic hydrogen.

    Science.gov (United States)

    Guisinger, Nathan P; Rutter, Gregory M; Crain, Jason N; First, Phillip N; Stroscio, Joseph A

    2009-04-01

    Graphene films on SiC exhibit coherent transport properties that suggest the potential for novel carbon-based nanoelectronics applications. Recent studies suggest that the role of the interface between single layer graphene and silicon-terminated SiC can strongly influence the electronic properties of the graphene overlayer. In this study, we have exposed the graphitized SiC to atomic hydrogen in an effort to passivate dangling bonds at the interface, while investigating the results utilizing room temperature scanning tunneling microscopy.

  1. Effect of dual buffer layer structure on the epitaxial growth of AlN on sapphire

    International Nuclear Information System (INIS)

    Highlights: ► A dual AlN buffer layer structure is proposed to grow AlN films. ► AlN films could be improved obviously by using the dual AlN buffer layer. ► The physical mechanism are discussed. - Abstract: A dual AlN buffer layer structure, including an isolated layer and a nucleation layer, is proposed to improve the growth of AlN films on sapphire substrate by metal organic chemical vapor deposition. This method is aimed to weaken the negative nitridation effect and improve lateral growth condition in the initial growth stage. It is found that suitably increasing the thickness of the nucleation layer is in favor of a better structural quality of the AlN film. An examination of surface morphology by atomic force microscopy suggests that the thicker the dual AlN buffer layer, the rougher the surface, and a higher quality of AlN epilayer is resulted.

  2. Study of photoresponsivity in optoelectronic devices based on single crystal β-Ga2O3 epitaxial layers

    Science.gov (United States)

    Horng, Ray-Hua; Ravadgar, Parvaneh

    2013-03-01

    Single crystal β-Ga2O3 epitaxial layers have been prepared on c-axis (0001) sapphire substrates using metalorganic chemical vapor deposition technique at relatively low temperature. Post-annealing of β-Ga2O3 single crystals up to 800 °C does not affect the crystallinity, explored by x-ray diffraction, showing that β-Ga2O3 epitaxial layers are highly (-201) oriented. Metal-semiconductor-metal devices are fabricated on single crystals to study their photoresponsivity. A significant improvement in performance of post annealed-based devices is observed, attributed to point defect reduction. Annealing of as-grown samples results to a significant decrease in both oxygen and gallium vacancies, which are sources of current leakage.

  3. Real structure of the ZnO epitaxial films on (0001) leucosapphire substrates coated by ultrathin gold layers

    Energy Technology Data Exchange (ETDEWEB)

    Muslimov, A. E., E-mail: amuslimov@mail.ru; Butashin, A. V.; Kolymagin, A. B.; Vasilyev, A. L.; Kanevsky, V. M. [Russian Academy of Sciences, Shubnikov Institute of Crystallography (Russian Federation)

    2016-01-15

    The real structure of ZnO films formed by magnetron sputtering on (0001) leucosapphire substrates coated by an ultrathin (less than 0.7 nm) Au buffer layer has been studied by high-resolution microscopy. It is shown that modification of the leucosapphire substrate surface by depositing ultrathin Au layers does not lead to the formation of Au clusters at the film–substrate interface but significantly improves the structural quality of ZnO epitaxial films. It is demonstrated that the simplicity and scalability of the technique used to modify the substrate surface in combination with a high (above 2 nm/s) film growth rate under magnetron sputtering make it possible to obtain high-quality (0001) ZnO epitaxial films with an area of 5–6 cm{sup 2}.

  4. Spectroscopic detection of atom-surface interactions in an atomic vapour layer with nanoscale thickness

    CERN Document Server

    Whittaker, K A; Hughes, I G; Sargsyan, A; Sarkisyan, D; Adams, C S

    2015-01-01

    We measure the resonance line shape of atomic vapor layers with nanoscale thickness confined between two sapphire windows. The measurement is performed by scanning a probe laser through resonance and collecting the scattered light. The line shape is dominated by the effects of Dicke narrowing, self-broadening, and atom-surface interactions. By fitting the measured line shape to a simple model we discuss the possibility to extract information about the atom-surface interaction.

  5. Growth temperature dependence of the surface segregation of Er atoms in GaAs during molecular beam epitaxy

    International Nuclear Information System (INIS)

    We have quantitatively studied the temperature dependence of the surface segregation of Er atoms in GaAs during molecular beam epitaxy using secondary ion mass spectroscopy. It was found that a significant number of Er atoms segregate to the growing surface at temperatures of 400°C and above and that the segregation decay length is approximately 0.5 µm at 500°C, indicating that the incorporation ratio of Er atoms into GaAs is less than 10-3. In contrast to the growth at higher temperatures, GaAs overlayer growth at a temperature as low as 300°C is effective in suppressing the surface segregation of Er and obtaining δ-doped structures. (author)

  6. Fabricating Buffer Layers for YBa2Cu3Oy Coated Conductor by Surface Oxidation Epitaxy

    Institute of Scientific and Technical Information of China (English)

    Yang Jian; Liu Huizhou; Gu Hongwei; Qu Fei; Fan Hongyan

    2005-01-01

    NiO buffer layers were formed on a tape of Ni for making YBCO coated conductor by surface-oxidation epitaxy (SOE) process. Different oxidizing conditions such as temperature and duration were studied for Ni tapes. It is found that the texture of NiO could be affected directly by the orientation and surface of substrate. X-ray diffraction (XRD) 2-2θ scan, φ-scan, and pole figure were employed to characterize the in-plane alignment and cube texture. X-ray φ-scan shows that NiO film is formed on Ni tape with high cube texture and a typical value at the full width at half maximum (FWHM) is ≤7.5°. Scanning electron microscopy was used to study the surface morphology of NiO films. No crack is found and the films appear dense. Such technique is simple and of low cost with perfect reproducibility, promising for developing long tapes.

  7. Thermodynamic analysis of the deposition of GaAs epitaxial layers prepared by the MOCVD method

    Energy Technology Data Exchange (ETDEWEB)

    Leitner, J.; Mikulec, J. (Dept. of Materials for Electronics, Prague Inst. of Chemical Tech. (Czechoslovakia)); Vonka, P. (Dept. of Physical Chemistry, Prague Inst. of Chemical Tech. (Czechoslovakia)); Stejskal, J.; Hladina, R.; Klima, P. (TESLA Research Inst. of Radiocommunication, Prague (Czechoslovakia))

    1991-06-01

    On the basis of a detailed thermodynamic analysis of the Ga-As-C-H system, the initial conditions have been determined, under which the reaction of trimethylgallium (TMGa) and arsine in a hydrogen atmosphere produces a single condensed phase - solid GaAs. Liquid gallium with a small amount of dissolved arsenic is formed simultaneously when the initial ratio of the elements is B{sup V}/A{sup III}<1, whereas solid graphite is simultaneously deposited at a high initial concentration of TMGa, especially at an elevated temperature and a decreased pressure. The equilibrium concentrations of the gaseous substances are strongly influenced by the initial B{sup V}/A{sup III} ratio. As{sub 2}, As{sub 4}, and CH{sub 4} are the dominant species if B{sup V}/A{sup III}>1, while CH{sub 4}, GaCH{sub 3}, GaH and GaH{sub 2} are the most abundant if B{sup V}/A{sup III} < 1. The calculated deposition diagrams are in good qualitative agreement with experimental results published in the literature. A comparison of the calculated composition of the gaseous phase and the results of experiments under the conditions used for the deposition of GaAs epitaxial layers leads to the conclusion that the course and results of the deposition process are significantly affected by transport and kinetic phenomena. (orig.).

  8. Crystallographic tilt in GaN layers grown by epitaxial lateral overgrowth

    Institute of Scientific and Technical Information of China (English)

    冯淦; 郑新和; 朱建军; 沈晓明; 张宝顺; 赵德刚; 孙元平; 张泽洪; 王玉田; 杨辉; 梁骏吾

    2002-01-01

    The crystallographic tilt in GaN layers grown by epitaxial lateral overgrowth (ELO) onsapphire (0001) substrates was investigated by using double crystal X-ray diffraction (DC-XRD). Itwas found that ELO GaN stripes bent towards the SiNx mask in the direction perpendicular toseeding lines. Each side of GaN (0002) peak in DC-XRD rocking curves was a broad peak relatedwith the crystallographic tilt. This broad peak split into two peaks (denoted as A and B), and peak Bdisappeared gradually when the mask began to be removed by selective etching. Only narrowpeak A remained when the SiNx mask was removed completely. A model based on these resultshas been developed to show that there are two factors responsible for the crystallographic tilt: Oneis the non-uniformity elastic deformation caused by the interphase force between the ELO GaNlayer and the SiNx mask. The other is the plastic deformation, which is attributed to the change ofthe threading dislocations (TDs) from vertical in the window regions to the lateral in the regionsover the mask.

  9. Nitrogen incorporation into GaAsN and InGaAsN layers grown by liquid-phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Milanova, Malina; Koleva, Greta; Popov, Georgy [Central Laboratory of Applied Physics, Plovdiv (Bulgaria); Vitanov, Petko [Central Laboratory of Solar Energy and New Energy Sources, Sofia (Bulgaria); Terziyska, Penka [Semiconductor Research Laboratory, Department of Electrical Engineering, Lakehead University, Thunder Bay, ON (Canada)

    2013-04-15

    This paper presents the comparison of nitrogen incorporation in GaAsN and InGaAsN layers grown on GaAs substrate from Ga- and In-rich solution, respectively, by liquid-phase epitaxy. Polycrystalline GaN has been used as a source of nitrogen in two cases. The initial epitaxy temperature has been varied in the temperature range 600-550 C. Nitrogen content in Ga{sub 1-x}AsN{sub x} grown layers has been determined to be in the range 0.1-0.5%. Higher nitrogen incorporation efficiency has been found for quaternary InGaAsN layers grown under carefully chosen lattice matched conditions. The incorporation of nitrogen into GaAsN and InGaAsN layers has been study by vibrational mode absorption spectroscopy. Nitrogen-induced vibration mode near 472 cm{sup -1} has been registered in GaAsN samples. Preferential In-N bonds and the formation of N-centred In{sub 3}Ga{sub 1} clusters have been identified for lattice matched to GaAs epitaxial InGaAsN layers. Electrical properties of the samples have been characterized by temperature-dependent Hall effect measurements. Nominally undoped GaAsN and InGaAsN grown layers are n-type with Hall concentration about one order of magnitude higher in comparison to layers not containing nitrogen. Thermally activated increase in the free carrier concentration at temperatures higher than 150 K is observed which indicates the presence of N-related deep donor levels below dilute nitride conduction band edge. (copyright 2013 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. Electrochemical atomic layer deposition of copper nanofilms on ruthenium

    Science.gov (United States)

    Gebregziabiher, Daniel K.; Kim, Youn-Geun; Thambidurai, Chandru; Ivanova, Valentina; Haumesser, Paul-Henri; Stickney, John L.

    2010-04-01

    As ULSI scales to smaller and smaller dimensions, it has become necessary to form layers of materials only a few nm thick. In addition, trenches are now being incorporated in ULSI formation which require conformal coating and will not be amenable to CMP. Atomic layer deposition (ALD) is being developed to address such issues. ALD is the formation of materials layer by layer using self-limiting reactions. This article describes the formation of Cu seed layers (for the Cu damascene process) on a Ru barrier layer. The deposit was formed by the electrochemical analog of ALD, using electrochemical self-limiting reactions which are referred to as underpotential deposition (UPD). Monolayer restricted galvanic displacement was used to form atomic layers of Cu. First Pb UPD was deposited, forming a sacrificial layer, and then a Cu +2 solution was flushed into the cell and Pb was exchanged for Cu. A linear dependence was shown for Cu growth over 8 ALD cycles, and STM showed a conformal deposition, as expected for an ALD process. Relative Cu coverages were determined using Auger electron spectroscopy, while absolute Cu coverages were obtained from coulometry during oxidative stripping of the deposits. Use of a Cl - containing electrolyte results in Cu deposits covered with an atomic layer of Cl atoms, which have been shown to protect the surfaced from oxidation during various stages of the deposition process. The 10 nm thick Ru substrates were formed on Si(1 0 0) wafers, and were partially oxidized upon receipt. Electrochemical reduction, prior to Cu deposition, removed the oxygen and some traces of carbon, the result of transport. Ion bombardment proved to clean all oxygen and carbon traces from the surface.

  11. An Introduction to Atomic Layer Deposition with Thermal Applications

    Science.gov (United States)

    Dwivedi, Vivek H.

    2015-01-01

    Atomic Layer Deposition (ALD) is a cost effective nano-manufacturing technique that allows for the conformal coating of substrates with atomic control in a benign temperature and pressure environment. Through the introduction of paired precursor gases thin films can be deposited on a myriad of substrates ranging from glass, polymers, aerogels, and metals to high aspect ratio geometries. This talk will focus on the utilization of ALD for engineering applications.

  12. Iridium wire grid polarizer fabricated using atomic layer deposition

    Directory of Open Access Journals (Sweden)

    Knez Mato

    2011-01-01

    Full Text Available Abstract In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on its good optical properties and a superior oxidation resistance. Furthermore, atomic layer deposition of iridium allows a precise adjustment of the structural parameters of the grating much better than other deposition techniques like sputtering for example. At the target wavelength of 250 nm, a transmission of about 45% and an extinction ratio of 87 are achieved.

  13. Plasma enhanced atomic layer deposition of ultrathin oxides on graphene

    Science.gov (United States)

    Trimble, Christie J.; Zaniewski, Anna M.; Kaur, Manpuneet; Nemanich, Robert J.

    2015-03-01

    Graphene, a single atomic layer of sp2 bonded carbon atoms, possesses extreme material properties that point toward a plethora of potential electronic applications. Many of these possibilities require the combination of graphene with dielectric materials such as metal oxides. Simultaneously, there is interest in new physical properties that emerge when traditionally three dimensional materials are constrained to ultrathin layers. For both of these objectives, we explore deposition of ultrathin oxide layers on graphene. In this project, we perform plasma enhanced atomic layer deposition (PEALD) of aluminum oxide on graphene that has been grown by chemical vapor deposition atop copper foil and achieve oxide layers that are <1.5 nm. Because exposure to oxygen plasma can cause the graphene to deteriorate, we explore techniques to mitigate this effect and optimize the PEALD process. Following deposition, the graphene and oxide films are transferred to arbitrary substrates for further analysis. We use x-ray photoelectron spectroscopy, Raman spectroscopy, and atomic force microscopy to assess the quality of the resulting films. This work is supported by the National Science Foundation under Grant # DMR-1206935.

  14. Layer by layer growth of BaTiO 3 thin films with extremely smooth surfaces by laser molecular beam epitaxy

    Science.gov (United States)

    Wang, H. S.; Ma, K.; Cui, D. F.; Peng, Z. Q.; Zhou, Y. L.; Lu, H. B.; Chen, Z. H.; Li, L.; Yang, G. Z.

    1997-05-01

    Using pure ozone-assisted laser molecular beam epitaxy, we have grown c-axis-oriented single crystal BaTiO 3 thin films on SrTiO 3 substrates at temperatures ( Ts) of 400-750°C and under ambient gas pressures of 5 × 10 -5 to 1 × 10 -1 Pa, respectively. Stripy reflection high-energy electron diffraction (RHEED) patterns and regular RHEED intensity oscillations reveal the smooth surface and layer-by-layer epitaxial growth of the films. Scanning electron microscopy analysis shows that the films are free of pinholes, grain boundaries and outgrowths on the surface. In addition, we found a strong dependence of the film lattice constant c on Ts, which might be related to the strain in the film.

  15. Dimensional dependence of phonon transport in freestanding atomic layer systems

    Science.gov (United States)

    Kim, Duckjong; Hwangbo, Yun; Zhu, Lijing; Mag-Isa, Alexander E.; Kim, Kwang-Seop; Kim, Jae-Hyun

    2013-11-01

    Due to the fast development of nanotechnology, we have the capability of manipulating atomic layer systems such as graphene, hexagonal boron nitride and dichalcogenides. The major concern in the 2-dimensional nanostructures is how to preserve their exceptional single-layer properties in 3-dimensional bulk structures. In this study, we report that the extreme phonon transport in graphene is highly affected by the graphitic layer stacking based on experimental investigation of the thermal conduction in few-layer graphene, 1-7 layers thick, suspended over holes of various diameters. We fabricate freestanding axisymmetric graphene structures without any perturbing substrate, and measure the in-plane transport property in terms of thermal conduction by using Raman spectroscopy. From the difference in susceptibility to substrate effect, size effect on hot-spot temperature variation and layer number dependence of thermal conductivity, we show that the graphitic membranes with 2 or more layers have characteristics similar to 3-dimensional graphite, which are very different from those of 2-dimensional graphene membranes. This implies that the scattering of out-of-plane phonons by interlayer atomic coupling could be a key mechanism governing the intrinsic thermal property.Due to the fast development of nanotechnology, we have the capability of manipulating atomic layer systems such as graphene, hexagonal boron nitride and dichalcogenides. The major concern in the 2-dimensional nanostructures is how to preserve their exceptional single-layer properties in 3-dimensional bulk structures. In this study, we report that the extreme phonon transport in graphene is highly affected by the graphitic layer stacking based on experimental investigation of the thermal conduction in few-layer graphene, 1-7 layers thick, suspended over holes of various diameters. We fabricate freestanding axisymmetric graphene structures without any perturbing substrate, and measure the in-plane transport

  16. Integration and structural analysis of strain relaxed bi-epitaxial zinc oxide(0001) thin film with silicon(100) using titanium nitride buffer layer

    International Nuclear Information System (INIS)

    Epitaxial growth of c-plane ZnO(0001) has been demonstrated on the Si(001) by using TiN as an intermediate buffer layer. Because of different out of plane symmetry of the substrate (Si/TiN) and the film (ZnO), two orientations of ZnO domains were obtained and the ZnO film growth is of bi-epitaxial nature. The ZnO thin film was observed to be nearly strain relaxed from X-ray and Raman measurements. The interface between the ZnO and TiN was investigated by transmission electron microscopy, and atomic arrangement has been modeled to understand the crystallographic orientation and structure of the domain/grain boundaries. Reaction at ZnO/TiN interface at higher growth temperature causing zinc titanate formation was observed. The grain boundary structure between the observed domains investigated by scanning transmission electron microscopy, revealed the ZnO(0001) planes to be contiguous across the grain boundary which is significant from the perspective of conduction electron scattering. In this configuration, the TiN (being electrically conductive) can be effectively used as an electrode for novel vertically integrated device applications (like light emitting diodes) directly on Si(100) substrate

  17. Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

    Energy Technology Data Exchange (ETDEWEB)

    Cerio, Frank

    2013-09-14

    The DOE has set aggressive goals for solid state lighting (SSL) adoption, which require manufacturing and quality improvements for virtually all process steps leading to an LED luminaire product. The goals pertinent to this proposed project are to reduce the cost and improve the quality of the epitaxial growth processes used to build LED structures. The objectives outlined in this proposal focus on achieving cost reduction and performance improvements over state-of-the-art, using technologies that are low in cost and amenable to high efficiency manufacturing. The objectives of the outlined proposal focus on cost reductions in epitaxial growth by reducing epitaxy layer thickness and hetero-epitaxial strain, and by enabling the use of larger, less expensive silicon substrates and would be accomplished through the introduction of a high productivity reactive sputtering system and an effective sputtered aluminum-nitride (AlN) buffer/nucleation layer process. Success of the proposed project could enable efficient adoption of GaN on-silicon (GaN/Si) epitaxial technology on 150mm silicon substrates. The reduction in epitaxy cost per cm{sup 2} using 150mm GaN-on-Si technology derives from (1) a reduction in cost of ownership and increase in throughput for the buffer deposition process via the elimination of MOCVD buffer layers and other throughput and CoO enhancements, (2) improvement in brightness through reductions in defect density, (3) reduction in substrate cost through the replacement of sapphire with silicon, and (4) reduction in non-ESD yield loss through reductions in wafer bow and temperature variation. The adoption of 150mm GaN/Si processing will also facilitate significant cost reductions in subsequent wafer fabrication manufacturing costs. There were three phases to this project. These three phases overlap in order to aggressively facilitate a commercially available production GaN/Si capability. In Phase I of the project, the repeatability of the performance

  18. Realization of high quality epitaxial current- perpendicular-to-plane giant magnetoresistive pseudo spin-valves on Si(001 wafer using NiAl buffer layer

    Directory of Open Access Journals (Sweden)

    Jiamin Chen

    2016-05-01

    Full Text Available In this letter, we report a NiAl buffer layer as a template for the integration of epitaxial current-perpendicular-plane-giant magnetoresistive (CPP-GMR devices on a Si(001 single crystalline substrate. By depositing NiAl on a Si wafer at an elevated temperature of 500 °C, a smooth and epitaxial B2-type NiAl(001 layer was obtained. The surface roughness was further improved by depositing Ag on the NiAl layer and applying subsequent annealing process. The epitaxial CPP-GMR devices grown on the buffered Si(001 substrate present a large magnetoresistive output comparable with that of the devices grown on an MgO(001 substrate, demonstrating the possibility of epitaxial spintronic devices with a NiAl templated Si wafer for practical applications.

  19. Realization of high quality epitaxial current- perpendicular-to-plane giant magnetoresistive pseudo spin-valves on Si(001) wafer using NiAl buffer layer

    Science.gov (United States)

    Chen, Jiamin; Liu, J.; Sakuraba, Y.; Sukegawa, H.; Li, S.; Hono, K.

    2016-05-01

    In this letter, we report a NiAl buffer layer as a template for the integration of epitaxial current-perpendicular-plane-giant magnetoresistive (CPP-GMR) devices on a Si(001) single crystalline substrate. By depositing NiAl on a Si wafer at an elevated temperature of 500 °C, a smooth and epitaxial B2-type NiAl(001) layer was obtained. The surface roughness was further improved by depositing Ag on the NiAl layer and applying subsequent annealing process. The epitaxial CPP-GMR devices grown on the buffered Si(001) substrate present a large magnetoresistive output comparable with that of the devices grown on an MgO(001) substrate, demonstrating the possibility of epitaxial spintronic devices with a NiAl templated Si wafer for practical applications.

  20. Structural Properties of Alternate Monatomic Layered [Fe/Co]n Epitaxial Films on MgO Substrate

    Science.gov (United States)

    Chu, In Chang; Saki, Yoshinobu; Kawasaki, Shohei; Doi, Masaaki; Sahashi, Masashi

    2008-06-01

    Body-centered-cubic (bcc) Fe50Co50 material is reported to show a high bulk spin scattering coefficient on current perpendicular to plane-giant magneto-resistance (CPP-GMR) system. But the origin of that phenomenon does not make sure yet. We prepared artificially alternate monatomic layered (AML) [Fe/Co] 41 MLs epitaxial films (Ts: 75, 250 °C) by monatomic deposition method and investigated the topology of AML [Fe/Co]n epitaxial films on MgO substrate with different orientation (001), (011) by the scanning tunnel microscopy (STM) and reflection high energy electron diffraction (RHEED), which we could confirm Frank-van der Merwe (FM) growth mode for AML [Fe/Co]n on MgO(001) and Volmer-Weber (VW) growth mode for that on Mg(011). The roughness of surface, Ra (0.20 nm) of AML [Fe/Co] 41 MLs epitaxial film grown at 75 °C on MgO(001) is smaller than that (0.46 nm) of AML [Fe/Co] grown at 250 °C on MgO(001), which has the large terraces of over 50 nm (Ra: 0.17 nm), even though there are some valleys between large terraces. Moreover we confirmed the structural properties of trilayered epitaxial films with AML [Fe/Co]n (Ra: 0.18 nm) and Fe50Co50 alloy epitaxial film on Au electrode by RHEED before confirming the characteristics of CPP-GMR devices.

  1. Van der Waals epitaxial double heterostructure: InAs/single-layer graphene/InAs.

    Science.gov (United States)

    Hong, Young Joon; Yang, Jae Won; Lee, Wi Hyoung; Ruoff, Rodney S; Kim, Kwang S; Fukui, Takashi

    2013-12-17

    Van der Waals (vdW) epitaxial double heterostructures have been fabricated by vdW epitaxy of InAs nanostructures on both sides of graphene. InAs nanostructures diametrically form on/underneath graphene exclusively along As-polar direction, indicating polarity inversion of the double heterostructures. First-principles and density functional calculations demonstrate how and why InAs easily form to be double heterostructures with polarity inversion.

  2. A Review of Atomic Layer Deposition for Nanoscale Devices

    Directory of Open Access Journals (Sweden)

    Edy Riyanto

    2012-12-01

    Full Text Available Atomic layer deposition (ALD is a thin film growth technique that utilizes alternating, self-saturation chemical reactions between gaseous precursors to achieve a deposited nanoscale layers. It has recently become a subject of great interest for ultrathin film deposition in many various applications such as microelectronics, photovoltaic, dynamic random access memory (DRAM, and microelectromechanic system (MEMS. By using ALD, the conformability and extreme uniformity of layers can be achieved in low temperature process. It facilitates to be deposited onto the surface in many variety substrates that have low melting temperature. Eventually it has advantages on the contribution to the wider nanodevices.

  3. Method and apparatus for depositing atomic layers on a substrate

    NARCIS (Netherlands)

    Vermeer, A.J.P.M.; Roozeboom, F.; Deelen, J. van

    2016-01-01

    Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises m

  4. Silicon protected with atomic layer deposited TiO2

    DEFF Research Database (Denmark)

    Seger, Brian; Tilley, David S.; Pedersen, Thomas;

    2013-01-01

    The semiconducting materials used for photoelectrochemical (PEC) water splitting must withstand the corrosive nature of the aqueous electrolyte over long time scales in order to be a viable option for large scale solar energy conversion. Here we demonstrate that atomic layer deposited titanium...

  5. Cost-Effective Systems for Atomic Layer Deposition

    Science.gov (United States)

    Lubitz, Michael; Medina, Phillip A., IV; Antic, Aleks; Rosin, Joseph T.; Fahlman, Bradley D.

    2014-01-01

    Herein, we describe the design and testing of two different home-built atomic layer deposition (ALD) systems for the growth of thin films with sub-monolayer control over film thickness. The first reactor is a horizontally aligned hot-walled reactor with a vacuum purging system. The second reactor is a vertically aligned cold-walled reactor with a…

  6. Segregation of Sb in Ge epitaxial layers and its usage for the selective doping of Ge-based structures

    International Nuclear Information System (INIS)

    The segregation of Sb in Ge epitaxial layers grown by the method of molecular beam epitaxy on Ge (001) substrates is investigated. For a growth temperature range of 180–325°C, the temperature dependence is determined for the segregation ratio of Sb in Ge, which shows a sharp increase (by more than three orders of magnitude) with increasing temperature. The strong dependence of the segregation properties of Sb on the growth temperature makes it possible to adapt a method based on the controlled use of segregation developed previously for the doping of Si structures for the selective doping of Ge structures with a donor impurity. Using this method selectively doped Ge:Sb structures, in which the bulk impurity concentration varies by an order of magnitude at distances of 3–5 nm, are obtained

  7. Segregation of Sb in Ge epitaxial layers and its usage for the selective doping of Ge-based structures

    Energy Technology Data Exchange (ETDEWEB)

    Antonov, A. V.; Drozdov, M. N.; Novikov, A. V., E-mail: anov@ipmras.ru; Yurasov, D. V. [Institute for Physics of Microstructures of the Russian Academy of Sciences (Russian Federation)

    2015-11-15

    The segregation of Sb in Ge epitaxial layers grown by the method of molecular beam epitaxy on Ge (001) substrates is investigated. For a growth temperature range of 180–325°C, the temperature dependence is determined for the segregation ratio of Sb in Ge, which shows a sharp increase (by more than three orders of magnitude) with increasing temperature. The strong dependence of the segregation properties of Sb on the growth temperature makes it possible to adapt a method based on the controlled use of segregation developed previously for the doping of Si structures for the selective doping of Ge structures with a donor impurity. Using this method selectively doped Ge:Sb structures, in which the bulk impurity concentration varies by an order of magnitude at distances of 3–5 nm, are obtained.

  8. Structural properties of GaN(0001) epitaxial layers revealed by high resolution X-ray diffraction

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    High-resolution X-ray diffraction has been used to analyze GaN(0001) epitaxial layers on sapphire substrates. Several structural properties of GaN, including the lattice constants, strains, and dislocation densities are revealed by the technique of X-ray dffraction (XRD). Lattice constants calculated from the omega/2theta scan are c=0.5185 nm and a=0.3157 nm. Also, the in-plane strain is -1.003%, while out of the plane, the epitaxial film is almost relaxed. Several methods are used to deduce the mosaicity and dislocation density of GaN, showing that the edge type dislocations are the overwhelming majority.

  9. Role of radiation defects in photoconductivity transients and photoluminescence spectra of epitaxial GaN layers

    Energy Technology Data Exchange (ETDEWEB)

    Gaubas, E.; Kazlauskas, K.; Vaitkus, J.; Zukauskas, A. [Institute of Materials Science and Applied Research, Vilnius University, Sauletekio 10, 10223 Vilnius (Lithuania)

    2005-05-01

    Effect of radiation defects on photoconductivity transients and photoluminescence (PL) spectra has been examined in semi-insulating GaN epitaxial layers. Manifestation of defects induced by x-ray irradiation with the dose of 600 Mrad and neutrons with the fluence of 5 x 10{sup 14} cm {sup -2} has been revealed through steady-state and pulsed PL as well as through contact photoconductivity (CPC) and microwave absorption (MWA) transients. Synchronous decrease in the PL intensity of yellow (Y), blue (B) and ultraviolet (UV) bands peaked at 2.19 eV, 2.85 eV and 3.42 eV, respectively, with increasing the density of radiation-induced defects was observed. The observed effect of radiation on the PL characteristics has been explained by interaction of the radiation defects with the native traps, responsible for Y-band PL or by structural modification of the ''yellow'' centers. The decrease in the PL intensity with concentration of radiation-induced defects is accompanied by an increase of the asymptotic decay lifetimes in time-stretched multi-trapping processes. The CPC and MWA decays, reflecting these processes, fit well a stretched-exponent approximation exp[-(t/{tau}){sup {alpha}}] with the time-stretching factor {alpha} that transforms from {alpha}=0.7 for as-grown material to {alpha}=0.3 for irradiated one. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. A DFT study of halogen atoms adsorbed on graphene layers

    Energy Technology Data Exchange (ETDEWEB)

    Medeiros, Paulo V C; De Brito Mota, F; De Castilho, Caio M C [Grupo de Fisica de Superfcies e Materiais, Instituto de Fisica, Universidade Federal da Bahia, Campus Universitario da Federacao/Ondina, 40170-115 Salvador, Bahia (Brazil); Mascarenhas, Artur J S, E-mail: caio@ufba.br [Instituto Nacional de Ciencia e Tecnologia em Energia e Ambiente-INCT-E and A, Universidade Federal da Bahia, 40170-280 Salvador, Bahia (Brazil)

    2010-12-03

    In this work, ab initio density functional theory calculations were performed in order to study the structural and electronic properties of halogens (X = fluorine, chlorine, bromine or iodine) that were deposited on both sides of graphene single layers (X-graphene). The adsorption of these atoms on only one side of the layer with hydrogen atoms adsorbed on the other was also considered (H,X-graphene). The results indicate that the F-C bond in the F-graphene system causes an sp{sup 2} to sp{sup 3} transition of the carbon orbitals, and similar effects seem to occur in the H,X-graphene systems. For the other cases, two configurations are found: bonded (B) and non-bonded (NB). For the B configuration, the structural arrangement of the atoms was similar to F-graphene and H-graphene (graphane), although the electronic structures present some differences. In the NB configuration, the interaction between the adsorbed atoms and the graphene layer seems to be essentially of the van der Waals type. In these cases, the original shape of the graphene layer presents only small deviations from the pristine form and the adsorbed atoms reach equilibrium far from the sheet. The F-graphene structure has a direct bandgap of approximately 3.16 eV at the {Gamma} point, which is a value that is close to the value of 3.50 eV that was found for graphane. The Cl-graphene (B configuration), H,F-graphene and H,Cl-graphene systems have smaller bandgap values. All of the other systems present metallic behaviours. Energy calculations indicate the possible stability of these X-graphene layers, although some considerations about the possibility of spontaneous formation have to be taken into account.

  11. CMUTs with High-K Atomic Layer Deposition Dielectric Material Insulation Layer

    OpenAIRE

    Xu, Toby; Tekes, Coskun; Degertekin, F. Levent

    2014-01-01

    Use of high-κ dielectric, atomic layer deposition (ALD) materials as an insulation layer material for capacitive micromachined ultrasonic transducers (CMUTs) is investigated. The effect of insulation layer material and thickness on CMUT performance is evaluated using a simple parallel plate model. The model shows that both high dielectric constant and the electrical breakdown strength are important for the dielectric material, and significant performance improvement can be achieved, especiall...

  12. Synthesis, structure and electrochemical properties of novel Li-Co-Mn-O epitaxial thin-film electrode using layer-by-layer deposition process

    Science.gov (United States)

    Lim, Jaemin; Lee, Soyeon; Suzuki, Kota; Kim, KyungSu; Kim, Sangryun; Taminato, Sou; Hirayama, Masaaki; Oshima, Yoshifumi; Takayanagi, Kunio; Kanno, Ryoji

    2015-04-01

    A novel epitaxial thin-film electrode for lithium batteries, with a composition of Li0.92Co0.65Mn1.35O4 and a cubic spinel structure, is fabricated on a SrTiO3(111) single-crystal substrate. Fabrication is carried out by layer-by-layer pulsed laser deposition of LiCoO2 with a layered rock-salt structure and LiMn2O4 with a spinel structure. The electrode is found to exhibit unique disordering of the lithium (8a) and transition-metal (16d) sites, leading to a higher rate capability and cycle retention ratio than those for a thin-film electrode with the same composition prepared by a conventional single-step deposition process. The proposed layer-by-layer deposition method allows an expanded range of compositional and structural variations for lithium battery electrode materials.

  13. Atomic and molecular layer deposition for surface modification

    Energy Technology Data Exchange (ETDEWEB)

    Vähä-Nissi, Mika, E-mail: mika.vaha-nissi@vtt.fi [VTT Technical Research Centre of Finland, PO Box 1000, FI‐02044 VTT (Finland); Sievänen, Jenni; Salo, Erkki; Heikkilä, Pirjo; Kenttä, Eija [VTT Technical Research Centre of Finland, PO Box 1000, FI‐02044 VTT (Finland); Johansson, Leena-Sisko, E-mail: leena-sisko.johansson@aalto.fi [Aalto University, School of Chemical Technology, Department of Forest Products Technology, PO Box 16100, FI‐00076 AALTO (Finland); Koskinen, Jorma T.; Harlin, Ali [VTT Technical Research Centre of Finland, PO Box 1000, FI‐02044 VTT (Finland)

    2014-06-01

    Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas–solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin – even non-uniform – atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. - Graphical abstract: Print quality of a polylactide film surface modified with atomic layer deposition prior to inkjet printing (360 dpi) with an aqueous ink. Number of printed dots illustrated as a function of 0, 5, 15 and 25 deposition cycles of trimethylaluminum and water. - Highlights: • ALD/MLD can be used to adjust surface characteristics of films and fiber materials. • Hydrophobicity after few deposition cycles of Al{sub 2}O{sub 3} due to e.g. complex formation. • Same effect on cellulosic fabrics observed with low temperature deposited TiO{sub 2}. • Different film growth and oxidation potential with different precursors. • Hybrid layer on inorganic layer can be used to improve adhesion of polymer melt.

  14. Reducing interface recombination for Cu(In,Ga)Se2 by atomic layer deposited buffer layers

    International Nuclear Information System (INIS)

    Partial CuInGaSe2 (CIGS) solar cell stacks with different atomic layer deposited buffer layers and pretreatments were analyzed by photoluminescence (PL) and capacitance voltage (CV) measurements to investigate the buffer layer/CIGS interface. Atomic layer deposited ZnS, ZnO, and SnOx buffer layers were compared with chemical bath deposited CdS buffer layers. Band bending, charge density, and interface state density were extracted from the CV measurement using an analysis technique new to CIGS. The surface recombination velocity calculated from the density of interface traps for a ZnS/CIGS stack shows a remarkably low value of 810 cm/s, approaching the range of single crystalline II–VI systems. Both the PL spectra and its lifetime depend on the buffer layer; thus, these measurements are not only sensitive to the absorber but also to the absorber/buffer layer system. Pretreatment of the CIGS prior to the buffer layer deposition plays a significant role on the electrical properties for the same buffer layer/CIGS stack, further illuminating the importance of good interface formation. Finally, ZnS is found to be the best performing buffer layer in this study, especially if the CIGS surface is pretreated with potassium cyanide

  15. Epitaxial growth and electronic structure of a layered zinc pnictide semiconductor, β-BaZn2As2

    International Nuclear Information System (INIS)

    BaZn2As2 is expected for a good p-type semiconductor and has two crystalline phases of an orthorhombic α phase and a higher-symmetry tetragonal β phase. Here, we report that high-quality epitaxial films of the tetragonal β-BaZn2As2 were grown on single-crystal MgO (001) substrates by a reactive solid-phase epitaxy technique. Out-of-plane and in-plane epitaxial relationships between the film and the substrate were BaZn2As2 (00 l)//MgO (001) and BaZn2As2 [200]//MgO [200], respectively. The full-widths at half maximum were 0.082° for a 008 out-of-plane rocking curve and 0.342° for a 200 in-plane rocking curve. A step-and-terrace structure was observed by atomic force microscopy. The band gap of β-BaZn2As2 was evaluated to be around 0.2 eV, which is much smaller than that of a family compound LaZnOAs (1.5 eV). Density functional theory calculation using the Heyd–Scuseria–Ernzerhof hybrid functionals supports the small band gap. - Highlights: • High-quality epitaxial β-BaZn2As2 films were obtained. • The band gap of β-BaZn2As2 was evaluated to around 0.2 eV. • Hybrid Heyd–Scuseria–Ernzerhof calculation supports the small band gap

  16. Ge Implantation to Improve Crystallinity and Productivity for Solid Phase Epitaxy Prepared by Atomic Mass Unit Cross Contamination-Free Technique

    Science.gov (United States)

    Lee, Kong-Soo; Yoo, Dae-Han; Han, Jae-Jong; Son, Gil-Hwan; Lee, Chang-Hun; Noh, Ju-Hee; Kim, Seok-Jae; Kim, Yong-Kwon; You, Young-Sub; Hyung, Yong-Woo; Lee, Hyeon-Deok

    2006-11-01

    Germanium (Ge) ion implantation was investigated for crystallinity enhancement during solid phase epitaxial (SPE) regrowth. Electron back-scatter diffraction (EBSD) measurement showed numerical increase of 19% of (100) signal, which might be due to the effect of pre-amorphization implantation (PAI) on silicon layer. On the other hand, electrical property such as off-leakage current of n-channel metal oxide semiconductor (NMOS) transistor degraded in specific regions of wafers. It was confirmed that arsenic (As) atoms were incorporated into channel area during Ge ion implantation. Since the equipment for Ge PAI was using several source gases such as BF3 and AsH3, atomic mass unit (AMU) contamination during PAI of Ge with AMU 74 caused the incorporation of As with AMU 75 which resided in arc-chamber and other parts of the equipment. It was effective to use Ge isotope of AMU 72 to suppress AMU contamination. It was effective to use enriched Ge source gas with AMU 72 in order to improve productivity.

  17. Interfacial Atomic Structure of Twisted Few-Layer Graphene.

    Science.gov (United States)

    Ishikawa, Ryo; Lugg, Nathan R; Inoue, Kazutoshi; Sawada, Hidetaka; Taniguchi, Takashi; Shibata, Naoya; Ikuhara, Yuichi

    2016-01-01

    A twist in bi- or few-layer graphene breaks the local symmetry, introducing a number of intriguing physical properties such as opening new bandgaps. Therefore, determining the twisted atomic structure is critical to understanding and controlling the functional properties of graphene. Combining low-angle annular dark-field electron microscopy with image simulations, we directly determine the atomic structure of twisted few-layer graphene in terms of a moiré superstructure which is parameterized by a single twist angle and lattice constant. This method is shown to be a powerful tool for accurately determining the atomic structure of two-dimensional materials such as graphene, even in the presence of experimental errors. Using coincidence-site-lattice and displacement-shift-complete theories, we show that the in-plane translation state between layers is not a significant structure parameter, explaining why the present method is adequate not only for bilayer graphene but also a few-layered twisted graphene. PMID:26888259

  18. Atomic layer deposition of alternative glass microchannel plates

    International Nuclear Information System (INIS)

    The technique of atomic layer deposition (ALD) has enabled the development of alternative glass microchannel plates (MCPs) with independently tunable resistive and emissive layers, resulting in excellent thickness uniformity across the large area (20 × 20 cm), high aspect ratio (60:1 L/d) glass substrates. Furthermore, the use of ALD to deposit functional layers allows the optimal substrate material to be selected, such as borosilicate glass, which has many benefits compared to the lead-oxide glass used in conventional MCPs, including increased stability and lifetime, low background noise, mechanical robustness, and larger area (at present up to 400 cm2). Resistively stable, high gain MCPs are demonstrated due to the deposition of uniform ALD resistive and emissive layers on alternative glass microcapillary substrates. The MCP performance characteristics reported include increased stability and lifetime, low background noise (0.04 events cm−2 s−1), and low gain variation (±5%)

  19. Stanene: Atomically Thick Free-standing Layer of 2D Hexagonal Tin.

    Science.gov (United States)

    Saxena, Sumit; Chaudhary, Raghvendra Pratap; Shukla, Shobha

    2016-01-01

    Stanene is one of most important of 2D materials due to its potential to demonstrate room temperature topological effects due to opening of spin-orbit gap. In this pursuit we report synthesis and investigation of optical properties of stanene up to few layers, a two-dimensional hexagonal structural analogue of graphene. Atomic scale morphological and elemental characterization using HRTEM equipped with SAED and EDAX detectors confirm the presence of hexagonal lattice of Sn atoms. The position of Raman peak along with the inter-planar 'd' spacing obtained from SAED for prepared samples are in good agreement with that obtained from first principles calculations and confirm that the sheets are not (111) α-Sn sheets. Further, the optical signature calculated using density functional theory at ~191 nm and ~233 nm for low buckled stanene are in qualitative agreement with the measured UV-Vis absorption spectrum. AFM measurements suggest interlayer spacing of ~0.33 nm in good agreement with that reported for epitaxial stanene sheets. No traces of oxygen were observed in the EDAX spectrum suggesting the absence of any oxidized phases. This is also confirmed by Raman measurements by comparing with oxidized stanene sheets. PMID:27492139

  20. Crystal Growth and Characterization of Epitaxial Layers of Laser and Nonlinear Optical Materials for Thin-Disk and Waveguide laser applications

    Energy Technology Data Exchange (ETDEWEB)

    W Bolanos; M Segura; J Cugat; J Carvajal; X Mateos; M Pujol; R Solé; F Díaz; M Aguiló; et. al.

    2011-12-31

    This paper summarizes the main results we obtained in our laboratories in relation with crystalline layers obtained by liquid phase epitaxial growth of lanthanide doped KLu(WO{sub 4}){sub 2} and Nb:RbTiOPO{sub 4} grown on KLu(WO{sub 4}){sub 2} and RbTiOPO{sub 4} substrates, respectively. Macroscopic defect free epitaxial layers were grown and characterized in terms of their compositional homogeneity, structural stress in the layer/substrate interface and laser and waveguiding performances.

  1. Strain and crystalline defects in epitaxial GaN layers studied by high-resolution X-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Chierchia, Rosa

    2007-07-01

    This thesis treats strain and dislocations in MOVPE GaN layers. The mosaic structure of metalorganic vapour phase epitaxy (MOVPE)-grown GaN layers was studied in dependence on the grain diameter utilizing high-resolution XRD. Different models for the defect structure were analyzed, the edge type TD densities were calculated under the assumption that the dislocations are not randomly distributed but localized at the grain boundaries. Moreover, in situ measurements have shown that the layers are under tension in the c-plane when a nucleation layer is used. The second part of this thesis treats a particular approach to reduce dislocations in MOVPE GaN layers, i.e. maskless pendeo epitaxial growth of MOVPE GAN layers. FE simulations assuming the strain to be completely induced during cooling of the structures after growth agree only partly with experimental data. The strain state of single layers and stripes of GaN grown on SiC was studied to exploit the evolution of the strain in the different phases of the PE growth. The biaxial compressive stress, due to the lattice mismatch between the GaN layer and the AlN nucleation layer is plastically relieved before overgrowth. Temperature dependent measurements show a linear reduction of the wing tilt with increasing temperature varying from sample to sample. Bent TDs have been observed in TEM images of maskless PE samples. Stress induced from the mismatch between the AlN buffer layer and the GaN also contributes to the remaining part of the wing tilt not relieved thermally. It has to be noted that the rest tilt value varies from sample to sample at the growth temperature. In fact some of the data indicate that the wing tilt decreases with increasing V/III ratio. In the last Chapter the application of X-ray techniques for the analysis of strain and composition in layers of inhomogeneous composition is explored. In the first part of the Chapter the strain state and the Al content of AlGaN buffer layers grown directly on (0001

  2. Epitaxial crystallization and nucleation during MeV-ion beam processing of amorphous GaAs surface layers

    Energy Technology Data Exchange (ETDEWEB)

    Bachmann, T. [Jena Univ. (Germany). Inst. fuer Festkoerperphysik; Glaser, E. [Jena Univ. (Germany). Inst. fuer Festkoerperphysik; Schulz, R. [Jena Univ. (Germany). Inst. fuer Festkoerperphysik; Kaiser, U. [Jena Univ. (Germany). Inst. fuer Festkoerperphysik; Safran, G. [Research Institute for Technical Physics, P.O. Box 76, H-1325 Budapest (Hungary)

    1996-06-01

    <100> -GaAs wafers were preamorphized in a thin surface layer using 50 keV {sup 14}N{sup +}-ions. Ion beam induced epitaxial crystallization (IBIEC) and interfacial amorphization (IBIIA) were studied as a function of the target temperature using MeV Ar{sup +}- or Kr{sup +}-ions. Backscattering experiments and electron microscopy show that the IBIEC process is stopped above a critical irradiation temperature due to enhanced ion beam induced nucleation and growth of crystallites. At a fixed dose an optimum irradiation temperature for IBIEC was found, at which the recrystallized layer thickness has a maximum and crystallite formation is negligible. This offers the possibility to crystallize much larger layer thicknesses than {approx}65 nm which stands for the maximum value reported up to now. (orig.).

  3. Atomic layer deposited aluminum oxide barrier coatings for packaging materials

    Energy Technology Data Exchange (ETDEWEB)

    Hirvikorpi, Terhi, E-mail: terhi.hirvikorpi@vtt.f [Oy Keskuslaboratorio - Centrallaboratorium Ab (KCL), P.O. Box 70, FI-02151 Espoo (Finland); Vaehae-Nissi, Mika, E-mail: mika.vaha-nissi@vtt.f [Oy Keskuslaboratorio - Centrallaboratorium Ab (KCL), P.O. Box 70, FI-02151 Espoo (Finland); Mustonen, Tuomas, E-mail: tuomas.mustonen@vtt.f [Oy Keskuslaboratorio - Centrallaboratorium Ab (KCL), P.O. Box 70, FI-02151 Espoo (Finland); Iiskola, Eero, E-mail: eero.iiskola@kcl.f [Oy Keskuslaboratorio - Centrallaboratorium Ab (KCL), P.O. Box 70, FI-02151 Espoo (Finland); Karppinen, Maarit, E-mail: maarit.karppinen@tkk.f [Laboratory of Inorganic Chemistry, Department of Chemistry, Helsinki University of Technology, P.O. Box 6100, FI-02015 TKK (Finland)

    2010-03-01

    Thin aluminum oxide coatings have been deposited at a low temperature of 80 {sup o}C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al{sub 2}O{sub 3} coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

  4. Suppressing unstable deformation of nanocolloidal crystals with atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Di [Department of Mechanical Engineering, Villanova University, Villanova, PA 19085 (United States); Zhang, Lei; Lee, Daeyeon [Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, PA 19104 (United States); Cheng, Xuemei [Department of Physics, Bryn Mawr College, Bryn Mawr, PA 19010 (United States); Feng, Gang, E-mail: gang.feng@villanova.edu [Department of Mechanical Engineering, Villanova University, Villanova, PA 19085 (United States)

    2015-07-15

    Despite their useful photonic properties, poor mechanical robustness hinders the application of nanocolloidal crystals (NCCs). Understanding the mechanical behavior of NCCs is critical to propose effective reinforcement techniques. We find that as-assembled NCCs exhibit unstable deformation, manifested as pop-ins upon nanoindentation. By deepening indentation, the unstable deformation mode transitions from NC dislodging to shear band (SB) formation. We find that alumina atomic layer deposition (ALD) significantly suppresses NC dislodging and SB formations in NCCs by increasing interparticle bonding.

  5. Silicon protected with atomic layer deposited TiO2

    DEFF Research Database (Denmark)

    Seger, Brian; Tilley, S. David; Pedersen, Thomas;

    2013-01-01

    of atomic layer deposited TiO2 increased the donor density from an as-deposited value of 1.3 × 1019 cm -3 to 2.2 × 1020 cm-3 following the annealing step. Using an Fe(ii)/Fe(iii) redox couple it was shown that the lower dopant density only allows electron transfer through TiO2 under conditions of weak band...

  6. Channel cracks in atomic-layer and molecular-layer deposited multilayer thin film coatings

    International Nuclear Information System (INIS)

    Metal oxide thin film coatings produced by atomic layer deposition have been shown to be an effective permeation barrier. The primary failure mode of such coatings under tensile loads is the propagation of channel cracks that penetrate vertically into the coating films. Recently, multi-layer structures that combine the metal oxide material with relatively soft polymeric layers produced by molecular layer deposition have been proposed to create composite thin films with desired properties, including potentially enhanced resistance to fracture. In this paper, we study the effects of layer geometry and material properties on the critical strain for channel crack propagation in the multi-layer composite films. Using finite element simulations and a thin-film fracture mechanics formalism, we show that if the fracture energy of the polymeric layer is lower than that of the metal oxide layer, the channel crack tends to penetrate through the entire composite film, and dividing the metal oxide and polymeric materials into thinner layers leads to a smaller critical strain. However, if the fracture energy of the polymeric material is high so that cracks only run through the metal oxide layers, more layers can result in a larger critical strain. For intermediate fracture energy of the polymer material, we developed a design map that identifies the optimal structure for given fracture energies and thicknesses of the metal oxide and polymeric layers. These results can facilitate the design of mechanically robust permeation barriers, an important component for the development of flexible electronics.

  7. Overview of atomic layer etching in the semiconductor industry

    Energy Technology Data Exchange (ETDEWEB)

    Kanarik, Keren J., E-mail: keren.kanarik@lamresearch.com; Lill, Thorsten; Hudson, Eric A.; Sriraman, Saravanapriyan; Tan, Samantha; Marks, Jeffrey; Vahedi, Vahid; Gottscho, Richard A. [Lam Research Corporation, 4400 Cushing Parkway, Fremont, California 94538 (United States)

    2015-03-15

    Atomic layer etching (ALE) is a technique for removing thin layers of material using sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for more than 25 years. Today, it is being driven by the semiconductor industry as an alternative to continuous etching and is viewed as an essential counterpart to atomic layer deposition. As we enter the era of atomic-scale dimensions, there is need to unify the ALE field through increased effectiveness of collaboration between academia and industry, and to help enable the transition from lab to fab. With this in mind, this article provides defining criteria for ALE, along with clarification of some of the terminology and assumptions of this field. To increase understanding of the process, the mechanistic understanding is described for the silicon ALE case study, including the advantages of plasma-assisted processing. A historical overview spanning more than 25 years is provided for silicon, as well as ALE studies on oxides, III–V compounds, and other materials. Together, these processes encompass a variety of implementations, all following the same ALE principles. While the focus is on directional etching, isotropic ALE is also included. As part of this review, the authors also address the role of power pulsing as a predecessor to ALE and examine the outlook of ALE in the manufacturing of advanced semiconductor devices.

  8. Epitaxial growth and characterization of thick multi-layer 4H-SiC for very high-voltage insulated gate bipolar transistors

    Science.gov (United States)

    Miyazawa, Tetsuya; Nakayama, Koji; Tanaka, Atsushi; Asano, Katsunori; Ji, Shi-yang; Kojima, Kazutoshi; Ishida, Yuuki; Tsuchida, Hidekazu

    2015-08-01

    Techniques to fabricate thick multi-layer 4H-SiC epitaxial wafers were studied for very high-voltage p- and n-channel insulated gate bipolar transistors (IGBTs). Multi-layer epitaxial growth, including a thick p- drift layer (˜180 μm), was performed on a 4H-SiC n+ substrate to form a p-IGBT structure. For an n-IGBT structure, an inverted growth process was employed, in which a thick n- drift layer (˜180 μm) and a thick p++ injector layer (>55 μm) were epitaxially grown. The epitaxial growth conditions were modified to attain a low defect density, a low doping concentration, and a long carrier lifetime in the drift layers. Reduction of the forward voltage drop was attempted by using carrier lifetime enhancement processes, specifically, carbon ion implantation/annealing and thermal oxidation/annealing or hydrogen annealing. Simple PiN diodes were fabricated to demonstrate the effective conductivity modulation in the thick drift layers. The forward voltage drops of the PiN diodes with the p- and n-IGBT structures promise to obtain the extremely low-loss and very high-voltage IGBTs. The change in wafer shape during the processing of the very thick multi-layer 4H-SiC is also discussed.

  9. Passivation effects of atomic-layer-deposited aluminum oxide

    Directory of Open Access Journals (Sweden)

    Kotipalli R.

    2013-09-01

    Full Text Available Atomic-layer-deposited (ALD aluminum oxide (Al2O3 has recently demonstrated an excellent surface passivation for both n- and p-type c-Si solar cells thanks to the presence of high negative fixed charges (Qf ~ 1012−1013 cm-2 in combination with a low density of interface states (Dit. This paper investigates the passivation quality of thin (15 nm Al2O3 films deposited by two different techniques: plasma-enhanced atomic layer deposition (PE-ALD and Thermal atomic layer deposition (T-ALD. Other dielectric materials taken into account for comparison include: thermally-grown silicon dioxide (SiO2 (20 nm, SiO2 (20 nm deposited by plasma-enhanced chemical vapour deposition (PECVD and hydrogenated amorphous silicon nitride (a-SiNx:H (20 nm also deposited by PECVD. With the above-mentioned dielectric layers, Metal Insulator Semiconductor (MIS capacitors were fabricated for Qf and Dit extraction through Capacitance-Voltage-Conductance (C-V-G measurements. In addition, lifetime measurements were carried out to evaluate the effective surface recombination velocity (SRV. The influence of extracted C-V-G parameters (Qf,Dit on the injection dependent lifetime measurements τ(Δn, and the dominant passivation mechanism involved have been discussed. Furthermore we have also studied the influence of the SiO2 interfacial layer thickness between the Al2O3 and silicon surface on the field-effect passivation mechanism. It is shown that the field effect passivation in accumulation mode is more predominant when compared to surface defect passivation.

  10. The structural transition from epitaxial Fe/Pt multilayers to an ordered FePt film using low energy ion beam sputtering deposition with no buffer layer

    International Nuclear Information System (INIS)

    An epitaxial L10 FePt thin film grown from an [Fe(10 Å)/Pt(10 Å)]15 multilayer with the orientation of (001) was prepared by an ion beam sputtering deposition method without buffer layer. From the measurement data of X-ray diffraction and X-ray reflectivity, the multilayer structure was totally disappeared and a uniform FePt alloy thin film was formed at temperatures higher than 600 °C. For the as-deposited thin film grown at 100 °C, the multilayer already possesses an epitaxial structure. The epitaxial relation is FePt(001)[100]//MgO(001)[100] and this epitaxial relation persists after sequential high temperature annealing. An epitaxial L10 ordered FePt(001) film with order parameter of 0.95 was obtained when the annealing temperature reached 650 °C. The ordered FePt(001) thin film has a perpendicular magnetic anisotropy with a squareness of 0.95 ± 0.03 on the magnetic hysteresis loop. This experiment demonstrates that the low energy ion beam sputtering deposition will preserve the epitaxial relation with no buffer layer between multilayer and substrate. - Highlights: • The Fe/Pt films using ion sputtering deposition with no buffer layer is epitaxial. • Multilayer structure was totally disappeared at temperatures higher than 600 °C. • Order parameter reach 0.95 after annealing at 650 °C. • Interfacial epitaxial FePt alloy already formed at 100 °C

  11. Synthesis of Indium Nitride Epitaxial Layers on a Substrate of Porous Indium Phosphide

    Directory of Open Access Journals (Sweden)

    J.A. Suchikova

    2015-10-01

    Full Text Available The paper presents a technique to obtain InN films on porous InP substrates by radical-beam gettering epitaxy. According to the results of the Auger spectroscopy, InN film thickness ranged from 100 nm to 0.5 microns depending on the etching conditions.

  12. Epitaxial growth of mixed conducting layered Ruddlesden–Popper La{sub n+1}Ni{sub n}O{sub 3n+1} (n = 1, 2 and 3) phases by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Kuan-Ting; Soh, Yeong-Ah; Skinner, Stephen J., E-mail: s.skinner@imperial.ac.uk

    2013-10-15

    Graphical abstract: - Highlights: • High quality epitaxial thin films of layered Ruddlesden–Popper nickelates were prepared. • For the first time this has been achieved by the PLD process. • n = 1, 2 and 3 films were successfully deposited on SrTiO{sub 3} and NdGaO{sub 3} substrates. • c-Axis oriented films were confirmed by XRD analysis. • In-plane and out-of-plane strain effects on lattice are discussed. - Abstract: Layered Ruddlesden–Popper phases of composition La{sub n+1}Ni{sub n}O{sub 3n+1} (n = 1, 2 and 3) have been epitaxially grown on SrTiO{sub 3} (0 0 1) or NdGaO{sub 3} (1 1 0) single crystal substrates using the pulsed laser deposition technique. X-ray diffraction analyses (θ/2θ, rocking curves, and φ-scans) and atomic force microscopy confirms the high-quality growth of the series of films with low surface roughness values (less than 1 nm). In particular, epitaxial growth of the higher order phases (n = 2 and 3) of lanthanum nickelate have been demonstrated for the first time.

  13. Comparative study of polar and semipolar (112⁻2) InGaN layers grown by metalorganic vapour phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Dinh, Duc V., E-mail: vanduc.dinh@tyndall.ie, E-mail: peter.parbrook@tyndall.ie; Zubialevich, V. Z. [Tyndall National Institute, University College Cork, Lee Matltings, Dyke Parade, Cork (Ireland); Oehler, F.; Kappers, M. J.; Humphreys, C. J. [Department of Materials Science and Metallurgy University of Cambridge, Pembroke Street, Cambridge CB2 3QZ (United Kingdom); Alam, S. N.; Parbrook, P. J., E-mail: vanduc.dinh@tyndall.ie, E-mail: peter.parbrook@tyndall.ie [Tyndall National Institute, University College Cork, Lee Matltings, Dyke Parade, Cork (Ireland); School of Engineering, University College Cork, Cork (Ireland); Caliebe, M.; Scholtz, F. [Institute of Optoelectronics, Ulm University, Ulm 89069 (Germany)

    2014-10-21

    InGaN layers were grown simultaneously on (112⁻2) GaN and (0001) GaN templates by metalorganic vapour phase epitaxy. At higher growth temperature (≥750°C), the indium content (<15%) of the (112⁻2) and (0001) InGaN layers was similar. However, for temperatures less than 750°C, the indium content of the (112⁻2) InGaN layers (15%–26%) were generally lower than those with (0001) orientation (15%–32%). The compositional deviation was attributed to the different strain relaxations between the (112⁻2) and (0001) InGaN layers. Room temperature photoluminescence measurements of the (112⁻2) InGaN layers showed an emission wavelength that shifts gradually from 380 nm to 580 nm with decreasing growth temperature (or increasing indium composition). The peak emission wavelength of the (112⁻2) InGaN layers with an indium content of more than 10% blue-shifted a constant value of ≈(50–60) nm when using higher excitation power densities. This blue-shift was attributed to band filling effects in the layers.

  14. Nanostructure templating using low temperature atomic layer deposition

    Science.gov (United States)

    Grubbs, Robert K.; Bogart, Gregory R.; Rogers, John A.

    2011-12-20

    Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.

  15. Nonstationary structure of atomic and molecular layers in electrothermal. Atomic absorption spectrometry: formation of atomic and molecular absorbing layers of gallium and indium

    International Nuclear Information System (INIS)

    The dynamics of the formation of absorbing layers of gallium and indium atoms and their compounds in a graphite tubular atomizer was investigated by the shadow spectral filming method. These compounds are localozed in the central part of the furnace over the platform and dissapear ay the hotter walls. It the case of gallium and indium atomization, the effects of chemical reactions between the vapor and the walls of the furnace on the formation of absorbing layers are stronger than that of diffusion and convective mass-transfer processes, which are common to all of the elements. Atom propagation from the center to the stomizer ends proceeds through the cascade mechanism because of its relatively low rate of warming up and strong longitudinal anisothermicity

  16. Properties of Ultra-Thin Hafnium Oxide and Interfacial Layer Deposited by Atomic Layer Deposition

    Institute of Scientific and Technical Information of China (English)

    Taeho Lee; Young-Bae Kim; Kyung-Il Hong; Duck-Kyun Choi; Jinho Ahn

    2004-01-01

    Ultra-thin hafnium-oxide gate dielectric films deposited by atomic layer deposition technique using HfCl4 and H2O precursor on a hydrogen-terminated Si substrate were investigated. X-ray photoelectron spectroscopy indicates that the interface layer is Hf-silicate rather than phase separated Hf-silicide and silicon oxide structure. The Hf-silicate interfacial layer partially changes into SiOx after high temperature annealing, resulting in a complex HfO2-silicate-SiOx dielectric structure. Electrical measurements confirms that HfO2 on Si is stable up to 700 ℃ for 30 s under N2 ambient.

  17. Molecular beam epitaxial growth and characterization of GaSb layers on GaAs (0 0 1) substrates

    Science.gov (United States)

    Li, Yanbo; Zhang, Yang; Zhang, Yuwei; Wang, Baoqiang; Zhu, Zhanping; Zeng, Yiping

    2012-06-01

    We report on the growth of GaSb layers on GaAs (0 0 1) substrates by molecular beam epitaxy (MBE). We investigate the influence of the GaAs substrate surface treatment, growth temperature, and V/III flux ratios on the crystal quality and the surface morphology of GaSb epilayers. Comparing to Ga-rich GaAs surface preparation, the Sb-rich GaAs surface preparation can promote the growth of higher-quality GaSb material. It is found that the crystal quality, electrical properties, and surface morphology of the GaSb epilayers are highly dependent on the growth temperature, and Sb/Ga flux ratios. Under the optimized growth conditions, we demonstrate the epitaxial growth of high quality GaSb layers on GaAs substrates. The p-type nature of the unintentionally doped GaSb is studied and from the growth conditions dependence of the hole concentrations of the GaSb, we deduce that the main native acceptor in the GaSb is the Ga antisite (GaSb) defect.

  18. Current Transport Behaviour of Au/n-GaAs Schottky Diodes Grown on Ge Substrate With Different Epitaxial Layer Thickness Over a Wide Temperature Range

    Directory of Open Access Journals (Sweden)

    N. Padha

    2011-01-01

    Full Text Available The work presents temperature dependent forward and reverse current-voltage (I-V analyses of n-GaAs/Au Schottky Diodes grown on n+ Ge substrate with different epitaxial layer thicknesses. While some of the Schottky diodes follow TED mechanism, others exceed significantly from this theory due to existence of patches of reduced barrier height embedded in the Schottky interface. The zero bias barrier heights (φbo increase (0.649 to 0.809 eV while the ideality factors (η decrease (1.514 to 1.052 with increase in epitaxial layer thickness (1-4 μm, thus, indicating similar behaviour to that observed for the I-V characteristics of the undertaken Schottky diodes with decreasing temperature. It all indicated the existence of barrier inhomogenities over the M-S interface. The breakdown behaviour analysis of these diodes showed some interesting results; the breakdown voltage (VBR decreases with temperature and shows ‘Defect Assisted Tunneling’ phenomenon through surface or defect states in the 1 μm thick epitaxial layer Schottky diode while VBR increases with temperature in 3 μm and 4 μm thick epitaxial layer Schottky diodes which demonstrate ‘Avalanche Multiplication’ mechanism responsible for junction breakdown. The reverse breakdown voltage is also seen to increase (2.7-5.9 Volts with the increase in epitaxial layer thickness of the diodes. The undertaken diodes have been observed to follow TFE mechanism at low temperatures (below 200 K in which the tunneling current component increases with epitaxial layer thickness which has been ascribed as an impact of GaAs/Ge hetero-interface over the Au/n-GaAs Schottky barrier.

  19. Film-coupled nanoparticles by atomic layer deposition: Comparison with organic spacing layers

    Energy Technology Data Exchange (ETDEWEB)

    Ciracì, Cristian, E-mail: cristian.ciraci@duke.edu; Mock, Jack J.; McGuire, Felicia; Liu, Xiaojun; Smith, David R. [Center for Metamaterials and Integrated Plasmonics and Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708 (United States); Chen, Xiaoshu; Oh, Sang-Hyun [Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, Minnesota 55455 (United States)

    2014-01-13

    Film-coupled nanoparticle systems have proven a reliable platform for exploring the field enhancement associated with sub-nanometer sized gaps between plasmonic nanostructures. In this Letter, we present a side-by-side comparison of the spectral properties of film-coupled plasmon-resonant, gold nanoparticles, with dielectric spacer layers fabricated either using atomic layer deposition or using organic layers (polyelectrolytes or self-assembled monolayers of molecules). In either case, large area, uniform spacer layers with sub-nanometer thicknesses can be accurately deposited, allowing extreme coupling regimes to be probed. The observed spectral shifts of the nanoparticles as a function of spacer layer thickness are similar for the organic and inorganic films and are consistent with numerical calculations taking into account the nonlocal response of the metal.

  20. Triangular Black Phosphorus Atomic Layers by Liquid Exfoliation

    Science.gov (United States)

    Seo, Soonjoo; Lee, Hyun Uk; Lee, Soon Chang; Kim, Yooseok; Kim, Hyeran; Bang, Junhyeok; Won, Jonghan; Kim, Youngjun; Park, Byoungnam; Lee, Jouhahn

    2016-03-01

    Few-layer black phosphorus (BP) is the most promising material among the two-dimensional materials due to its layered structure and the excellent semiconductor properties. Currently, thin BP atomic layers are obtained mostly by mechanical exfoliation of bulk BP, which limits applications in thin-film based electronics due to a scaling process. Here we report highly crystalline few-layer black phosphorus thin films produced by liquid exfoliation. We demonstrate that the liquid-exfoliated BP forms a triangular crystalline structure on SiO2/Si (001) and amorphous carbon. The highly crystalline BP layers are faceted with a preferred orientation of the (010) plane on the sharp edge, which is an energetically most favorable facet according to the density functional theory calculations. Our results can be useful in understanding the triangular BP structure for large-area applications in electronic devices using two-dimensional materials. The sensitivity and selectivity of liquid-exfoliated BP to gas vapor demonstrate great potential for practical applications as sensors.

  1. Atomic Layer Deposition Films as Diffusion Barriers for Silver Artifacts

    Science.gov (United States)

    Marquardt, Amy; Breitung, Eric; Drayman-Weisser, Terry; Gates, Glenn; Rubloff, Gary W.; Phaneuf, Ray J.

    2012-02-01

    Atomic layer deposition (ALD) was investigated as a means to create transparent oxide diffusion barrier coatings to reduce the rate of tarnishing for silver objects in museum collections. Accelerated aging by heating various thicknesses (5 to 100nm) of ALD alumina (Al2O3) thin films on sterling and fine silver was used to determine the effectiveness of alumina as a barrier to silver oxidation. The effect of aging temperature on the thickness of the tarnish layer (Ag2S) created at the interface of the ALD coating and the bulk silver substrate was determined by reflectance spectroscopy and X-Ray Photoelectric Spectroscopy (XPS). Reflectance spectroscopy was an effective rapid screening tool to determine tarnishing rates and the coating's visual impact. X-Ray Photoelectric Spectroscopy (XPS), and Time of Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) analysis showed a phase transformation in the Ag2S tarnish layer at 177 C and saturation in the thickness of the silver sulfide layer, indicating possible self-passivation of the tarnish layer.

  2. Thin film evolution equations from (evaporating) dewetting liquid layers to epitaxial growth

    International Nuclear Information System (INIS)

    In the present contribution we review basic mathematical results for three physical systems involving self-organizing solid or liquid films at solid surfaces. The films may undergo a structuring process by dewetting, evaporation/condensation or epitaxial growth, respectively. We highlight similarities and differences of the three systems based on the observation that in certain limits all of them may be described using models of similar form, i.e. time evolution equations for the film thickness profile. Those equations represent gradient dynamics characterized by mobility functions and an underlying energy functional. Two basic steps of mathematical analysis are used to compare the different systems. First, we discuss the linear stability of homogeneous steady states, i.e. flat films, and second the systematics of non-trivial steady states, i.e. drop/hole states for dewetting films and quantum-dot states in epitaxial growth, respectively. Our aim is to illustrate that the underlying solution structure might be very complex as in the case of epitaxial growth but can be better understood when comparing the much simpler results for the dewetting liquid film. We furthermore show that the numerical continuation techniques employed can shed some light on this structure in a more convenient way than time-stepping methods. Finally we discuss that the usage of the employed general formulation does not only relate seemingly unrelated physical systems mathematically, but does allow as well for discussing model extensions in a more unified way.

  3. Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition.

    Science.gov (United States)

    Sobel, Nicolas; Hess, Christian

    2015-12-01

    Controlled structuring of surfaces is interesting for a wide variety of areas, including microelectronic device fabrication, optical devices, bio(sensing), (electro-, photo)catalysis, batteries, solar cells, fuel cells, and sorption. A unique feature of atomic layer deposition (ALD) is the possibility to form conformal uniform coatings on arbitrarily shaped materials with controlled atomic-scale thickness. In this Minireview, we discuss the potential of ALD for the nanoscale structuring of surfaces, highlighting its versatile application to structuring both planar substrates and powder materials. Recent progress in the application of ALD to porous substrates has even made the nanoscale structuring of high-surface-area materials now feasible, thereby enabling novel applications, such as those in the fields of catalysis and alternative energy.

  4. Nanometer-Scale Epitaxial Strain Release in Perovskite Heterostructures Using 'SrAlOx' Sliding Buffer Layers

    Energy Technology Data Exchange (ETDEWEB)

    Bell, Christopher

    2011-08-11

    We demonstrate the strain release of LaAlO{sub 3} epitaxial film on SrTiO{sub 3} (001) by inserting ultra-thin 'SrAlO{sub x}' buffer layers. Although SrAlO{sub x} is not a perovskite, nor stable as a single phase in bulk, epitaxy stabilizes the perovskite structure up to a thickness of 2 unit cells (uc). At a critical thickness of 3 uc of SrAlO{sub x}, the interlayer acts as a sliding buffer layer, and abruptly relieves the lattice mismatch between the LaAlO{sub 3} filmand the SrTiO{sub 3} substrate, while maintaining crystallinity. This technique may provide a general approach for strain relaxation of perovskite film far below the thermodynamic critical thickness. A central issue in heteroepitaxial filmgrowth is the inevitable difference in lattice constants between the filmand substrate. Due to this lattice mismatch, thin film are subjected to microstructural strain, which can have a significan effect on the filmproperties. This challenge is especially prominent in the rapidly developing fiel of oxide electronics, where much interest is focused on incorporating the emergent physical properties of oxides in devices. Although strain can be used to great effect to engineer unusual ground states, it is often deleterious for bulk first-orde phase transitions, which are suppressed by the strain and symmetry constraints of the substrate. While there are some reports discussing the control of the lattice mismatch in oxides using thick buffer layers, the materials choice, lattice-tunable range, and control of misfit dislocations are still limited. In this Letter, we report the fabrication of strain-relaxed LaAlO{sub 3} (LAO) thin film on SrTiO{sub 3} (STO) (001) using very thin 'SrAlO{sub x}' (SAO) buffer layers. Whereas for 1 or 2 pseudo-perovskite unit cells (uc) of SAO, the subsequent LAO filmis strained to the substrate, at a critical thickness of 3 uc the SAO interlayer abruptly relieves the lattice mismatch between the LAO and the STO, although

  5. Oxygen Impurities and Defects in Epitaxial Layer SiC and SiC Wafer Characterized by Room and Low Temperatures FTIR

    Science.gov (United States)

    Lu, W. J.; Collins, W. E.; Shi, D. T.; Tung, Y. S.; Larkin, D. J.

    1998-01-01

    SiC as a highly promising semiconducting material has received increasing attention in the last decade. The impurities such as oxygen and hydrogen have a great effect in electronic properties of semiconducting materials. In this study, the FTIR spectra were measured at room temperature (25 C) and low temperature (-70 C) for an n-type SiC substrate, a p-type epitaxial layer SiC, and patterned Ta on a p-type epitaxial layer SiC sample. The oxygen related IR peaks were measured for all three samples at room and low temperatures. The peak at 1105 cm(exp -1) is the result of a substitutional carbon and a interstitial oxygen in SiC. The concentration of the impurity oxygen increases in the SiC epitaxial layer during the CVD and electron beam processes. For the n-type SiC substrate, this peak does not appear. The peak at 905 cm(exp -1) exists in the IR spectra only for two epitaxial layer on p-type SiC substrate samples. This peak is related to oxygen vacancy centers in SiC, which are introduced in the CVD epitaxial growth process. At low temperature, the peak at 1105 cm(exp -1) shifts down and the peak at 905 cm(exp -1) shifts up for the epitaxial layer SiC samples. It can be explained that, at low temperatures, the stress increases due to the distorted bonds. The study shows that FTIR is a very effective method to evaluate low concentration impurities in SiC.

  6. Atomic-level study of BiFe O3 under epitaxial strain

    Science.gov (United States)

    Graf, M.; Sepliarsky, M.; Stachiotti, M. G.

    2016-08-01

    Structural and thermal properties of BiFe O3 under compressive epitaxial strain are investigated using a shell model fitted to first-principles calculations. We show that a model developed for the bulk describes properly the behavior of the compound as function of the strain, including the appearance of tetragonallike phase with a large c /a ratio. The obtained temperature-strain phase diagram reproduces several features observed experimentally in thin films. Molecular dynamic simulations show that morphotropic phase boundary separating the R -like and T -like regions is temperature independent but with different phases along the transition region. The microscopic analysis of the temperature-strain phase diagram emphasizes the relevance of the interplay between polarization, oxygen octahedron rotations, and strain.

  7. Atomic Layer Deposited Catalysts for Fuel Cell Applications

    DEFF Research Database (Denmark)

    Johansson, Anne-Charlotte Elisabeth Birgitta

    layer deposition (ALD), on the other hand, is a highly suitable and still relatively unexplored approach for the synthesis of noble metal catalysts. It is a vapor phase growth method, primarily used to deposit thin lms. ALD is based on self-limiting chemical reactions of alternately injected precursors...... for the realization of such tiny devices. It is a mature technology, suitable for mass production, where versatile structuring is available at the micro and nano regime. Carbon black supported catalysts synthesized by wet chemistry methods are not readily applicable for standard microfabrication techniques. Atomic...

  8. Blistering during the atomic layer deposition of iridium

    Energy Technology Data Exchange (ETDEWEB)

    Genevée, Pascal, E-mail: pascal-genevee@chimie-paristech.fr, E-mail: a.szeghalmi@uni-jena.de; Ahiavi, Ernest; Janunts, Norik; Pertsch, Thomas; Kley, Ernst-Bernhard; Szeghalmi, Adriana, E-mail: pascal-genevee@chimie-paristech.fr, E-mail: a.szeghalmi@uni-jena.de [Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, 07743 Jena (Germany); Oliva, Maria [Fraunhofer IOF, Albert-Einstein-Strasse 7, 07743 Jena (Germany)

    2016-01-15

    The authors report on the formation of blisters during the atomic layer deposition of iridium using iridium acetylacetonate and oxygen precursors. Films deposited on fused silica substrates led to sparsely distributed large blisters while in the case of silicon with native oxide additional small blisters with a high density was observed. It is found that the formation of blisters is favored by a higher deposition temperature and a larger layer thickness. Postdeposition annealing did not have a significant effect on the formation of blisters. Finally, changing purge duration during the film growth allowed us to avoid blistering and evidenced that impurities released from the film in gas phase were responsible for the formation of blisters.

  9. Electrochemical Reaction in Single Layer MoS2: Nanopores Opened Atom by Atom.

    Science.gov (United States)

    Feng, J; Liu, K; Graf, M; Lihter, M; Bulushev, R D; Dumcenco, D; Alexander, D T L; Krasnozhon, D; Vuletic, T; Kis, A; Radenovic, A

    2015-05-13

    Ultrathin nanopore membranes based on 2D materials have demonstrated ultimate resolution toward DNA sequencing. Among them, molybdenum disulfide (MoS2) shows long-term stability as well as superior sensitivity enabling high throughput performance. The traditional method of fabricating nanopores with nanometer precision is based on the use of focused electron beams in transmission electron microscope (TEM). This nanopore fabrication process is time-consuming, expensive, not scalable, and hard to control below 1 nm. Here, we exploited the electrochemical activity of MoS2 and developed a convenient and scalable method to controllably make nanopores in single-layer MoS2 with subnanometer precision using electrochemical reaction (ECR). The electrochemical reaction on the surface of single-layer MoS2 is initiated at the location of defects or single atom vacancy, followed by the successive removals of individual atoms or unit cells from single-layer MoS2 lattice and finally formation of a nanopore. Step-like features in the ionic current through the growing nanopore provide direct feedback on the nanopore size inferred from a widely used conductance vs pore size model. Furthermore, DNA translocations can be detected in situ when as-fabricated MoS2 nanopores are used. The atomic resolution and accessibility of this approach paves the way for mass production of nanopores in 2D membranes for potential solid-state nanopore sequencing. PMID:25928894

  10. Atomic layer deposition of alternative glass microchannel plates

    Energy Technology Data Exchange (ETDEWEB)

    O' Mahony, Aileen, E-mail: aom@incomusa.com; Craven, Christopher A.; Minot, Michael J.; Popecki, Mark A.; Renaud, Joseph M.; Bennis, Daniel C.; Bond, Justin L.; Stochaj, Michael E.; Foley, Michael R.; Adams, Bernhard W. [Incom, Inc., 294 Southbridge Road, Charlton, Massachusetts 01507 (United States); Mane, Anil U.; Elam, Jeffrey W. [Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois 60439 (United States); Ertley, Camden; Siegmund, Oswald H. W. [Space Sciences Laboratory, University of California, 7 Gauss Way, Berkeley, California 94720 (United States)

    2016-01-15

    The technique of atomic layer deposition (ALD) has enabled the development of alternative glass microchannel plates (MCPs) with independently tunable resistive and emissive layers, resulting in excellent thickness uniformity across the large area (20 × 20 cm), high aspect ratio (60:1 L/d) glass substrates. Furthermore, the use of ALD to deposit functional layers allows the optimal substrate material to be selected, such as borosilicate glass, which has many benefits compared to the lead-oxide glass used in conventional MCPs, including increased stability and lifetime, low background noise, mechanical robustness, and larger area (at present up to 400 cm{sup 2}). Resistively stable, high gain MCPs are demonstrated due to the deposition of uniform ALD resistive and emissive layers on alternative glass microcapillary substrates. The MCP performance characteristics reported include increased stability and lifetime, low background noise (0.04 events cm{sup −2} s{sup −1}), and low gain variation (±5%)

  11. Bond-length variation in InxGa1-xAs/InP strained epitaxial layers

    Science.gov (United States)

    Romanato, F.; de Salvador, D.; Berti, M.; Drigo, A.; Natali, M.; Tormen, M.; Rossetto, G.; Pascarelli, S.; Boscherini, F.; Lamberti, C.; Mobilio, S.

    1998-06-01

    Tensile and compressive InxGa1-xAs epilayers grown on [001] InP substrates have been analyzed by fluorescence-detected x-ray-absorption fine structure in order to investigate the length variation suffered by Ga-As and In-As atomic bonds under epitaxial strain. A morphological and structural analysis had previously been performed in order to select only pseudomorphic samples with high lattice quality. A clear variation of the nearest-neighbor distances proportional to the tetragonal distortion of the film has been detected. We discuss the relationship between the long- and short-range descriptions of strain accommodation in the framework of an analytical model.

  12. Encapsulated solid phase epitaxy of a Ge quantum well embedded in an epitaxial rare earth oxide.

    Science.gov (United States)

    Laha, Apurba; Bugiel, E; Jestremski, M; Ranjith, R; Fissel, A; Osten, H J

    2009-11-25

    An efficient method based on molecular beam epitaxy has been developed to integrate an epitaxial Ge quantum well buried into a single crystalline rare earth oxide. The monolithic heterostructure comprised of Gd2O3-Ge-Gd2O3 grown on an Si substrate exhibits excellent crystalline quality with atomically sharp interfaces. This heterostructure with unique structural quality could be used for novel nanoelectronic applications in quantum-effect devices such as nanoscale transistors with a high mobility channel, resonant tunneling diode/transistors, etc. A phenomenological model has been proposed to explain the epitaxial growth process of the Ge layer under oxide encapsulation using a solid source molecular beam epitaxy technique. PMID:19875877

  13. Epitaxial growth of matched metallic ErP0.6As0.4 layers on GaAs

    International Nuclear Information System (INIS)

    Successful growth of (001)ErP0.6As0.4 single crystal film on (001) GaAs has been demonstrated. The epitaxial metallic layers reproducibly showed lattice mismatch below 5 10-4. This is, to the authors' knowledge, the first report of a stable, epitaxial and lattice-matched metal/compound semiconductor heterostructure. The ErP0.6As0.4/n-GaAs diodes yielded excellent I-V characteristics with an ideality factor of 1.1 and barrier height of 0.88 eV. For a 240 Angstrom- thick film, metallic behavior was observed with resistivities of 25 and 86 μΩcm at 1.5 K and room temperature, respectively. As the other Er compounds ErP, ErAs, ErSb and ErSi2, ErP0.6As0.4 presents an abrupt drop in resistivity in the vicinity of the liquid helium temperature, due to a paramagnetic to antiferromagnetic phase transition

  14. An Atomically Layered InSe Avalanche Photodetector.

    Science.gov (United States)

    Lei, Sidong; Wen, Fangfang; Ge, Liehui; Najmaei, Sina; George, Antony; Gong, Yongji; Gao, Weilu; Jin, Zehua; Li, Bo; Lou, Jun; Kono, Junichiro; Vajtai, Robert; Ajayan, Pulickel; Halas, Naomi J

    2015-05-13

    Atomically thin photodetectors based on 2D materials have attracted great interest due to their potential as highly energy-efficient integrated devices. However, photoinduced carrier generation in these media is relatively poor due to low optical absorption, limiting device performance. Current methods for overcoming this problem, such as reducing contact resistances or back gating, tend to increase dark current and suffer slow response times. Here, we realize the avalanche effect in a 2D material-based photodetector and show that avalanche multiplication can greatly enhance the device response of an ultrathin InSe-based photodetector. This is achieved by exploiting the large Schottky barrier formed between InSe and Al electrodes, enabling the application of a large bias voltage. Plasmonic enhancement of the photosensitivity, achieved by patterning arrays of Al nanodisks onto the InSe layer, further improves device efficiency. With an external quantum efficiency approaching 866%, a dark current in the picoamp range, and a fast response time of 87 μs, this atomic layer device exhibits multiple significant advances in overall performance for this class of devices.

  15. Atomic layer deposition of superparamagnetic and ferrimagnetic magnetite thin films

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Yijun; Liu, Ming, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca; Ren, Wei, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca [Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education and International Center for Dielectric Research, Xi' an Jiaotong University, Xi' an 710049 (China); Zhang, Yuepeng; Chen, Xing [Energy Systems Division, Argonne National Laboratory, Lemont, Illinois 60439 (United States); Ye, Zuo-Guang, E-mail: mingliu@mail.xjtu.edu.cn, E-mail: wren@mail.xjtu.edu.cn, E-mail: zye@sfu.ca [Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education and International Center for Dielectric Research, Xi' an Jiaotong University, Xi' an 710049 (China); Department of Chemistry and 4D LABS, Simon Fraser University, Burnaby, British Columbia V5A 1S6 (Canada)

    2015-05-07

    One of the key challenges in realizing superparamagnetism in magnetic thin films lies in finding a low-energy growth way to create sufficiently small grains and magnetic domains which allow the magnetization to randomly and rapidly reverse. In this work, well-defined superparamagnetic and ferrimagnetic Fe{sub 3}O{sub 4} thin films are successfully prepared using atomic layer deposition technique by finely controlling the growth condition and post-annealing process. As-grown Fe{sub 3}O{sub 4} thin films exhibit a conformal surface and poly-crystalline nature with an average grain size of 7 nm, resulting in a superparamagnetic behavior with a blocking temperature of 210 K. After post-annealing in H{sub 2}/Ar at 400 °C, the as-grown α−Fe{sub 2}O{sub 3} sample is reduced to Fe{sub 3}O{sub 4} phase, exhibiting a ferrimagnetic ordering and distinct magnetic shape anisotropy. Atomic layer deposition of magnetite thin films with well-controlled morphology and magnetic properties provides great opportunities for integrating with other order parameters to realize magnetic nano-devices with potential applications in spintronics, electronics, and bio-applications.

  16. Catalytically active single-atom niobium in graphitic layers.

    Science.gov (United States)

    Zhang, Xuefeng; Guo, Junjie; Guan, Pengfei; Liu, Chunjing; Huang, Hao; Xue, Fanghong; Dong, Xinglong; Pennycook, Stephen J; Chisholm, Matthew F

    2013-01-01

    Carbides of groups IV through VI (Ti, V and Cr groups) have long been proposed as substitutes for noble metal-based electrocatalysts in polymer electrolyte fuel cells. However, their catalytic activity has been extremely limited because of the low density and stability of catalytically active sites. Here we report the excellent performance of a niobium-carbon structure for catalysing the cathodic oxygen reduction reaction. A large number of single niobium atoms and ultra small clusters trapped in graphitic layers are directly identified using state-of-the-art aberration-corrected scanning transmission electron microscopy. This structure not only enhances the overall conductivity for accelerating the exchange of ions and electrons, but it suppresses the chemical/thermal coarsening of the active particles. Experimental results coupled with theory calculations reveal that the single niobium atoms incorporated within the graphitic layers produce a redistribution of d-band electrons and become surprisingly active for O2 adsorption and dissociation, and also exhibit high stability. PMID:23715283

  17. Plasma enhanced atomic layer deposition of silicon nitride using neopentasilane

    Energy Technology Data Exchange (ETDEWEB)

    Weeks, Stephen, E-mail: Stephen.Weeks@intermolecular.com; Nowling, Greg; Fuchigami, Nobi; Bowes, Michael; Littau, Karl [Intermolecular, 3011 North 1st Street, San Jose, California 95134 (United States)

    2016-01-15

    Progress in transistor scaling has increased the demands on the material properties of silicon nitride (SiN{sub x}) thin films used in device fabrication and at the same time placed stringent restrictions on the deposition conditions employed. Recently, low temperature plasma enhanced atomic layer deposition has emerged as a viable technique for depositing these films with a thermal budget compatible with semiconductor processing at sub-32 nm technology nodes. For these depositions, it is desirable to use precursors that are free from carbon and halogens that can incorporate into the film. Beyond this, it is necessary to develop processing schemes that minimize the wet etch rate of the film as it will be subjected to wet chemical processing in subsequent fabrication steps. In this work, the authors introduce low temperature deposition of SiN{sub x} using neopentasilane [NPS, (SiH{sub 3}){sub 4}Si] in a plasma enhanced atomic layer deposition process with a direct N{sub 2} plasma. The growth with NPS is compared to a more common precursor, trisilylamine [TSA, (SiH{sub 3}){sub 3 }N] at identical process conditions. The wet etch rates of the films deposited with NPS are characterized at different plasma conditions and the impact of ion energy is discussed.

  18. Epitaxial AlN layers on sapphire and diamond; Epitaktische AlN-Schichten auf Saphir und Diamant

    Energy Technology Data Exchange (ETDEWEB)

    Hermann, Martin

    2009-04-27

    In this work, epitaxial AlN layers deposited by molecular beam epitaxy on sapphire and diamond substrates were investigated. Starting from this AlN, the dopant silicon was added. The influence of the silicon doping on the structural properties of the host AlN crystal was investigated using high resolution X-ray diffraction. Once the silicon concentration exceeds 1 x 10{sup 19} cm{sup -3}, a significant change of the AlN:Si crystal can be observed: increasing the silicon concentration up to 5 x 10{sup 20} cm{sup -3} results in a decrease of the a lattice parameter by approximately 1.2 pm and an increase of the c lattice parameter by about 1.0 pm. The crystal is stressed additionally by adding silicon resulting in a increase of the biaxial compressive stress of up to 2.0 GPa. Further increase of the silicon concentration leads to lattice relaxation. This result from X-ray diffraction was independently confirmed by Raman spectroscopy investigations. Further increase of the silicon concentration leads to the generation of polycrystalline phases within the epitaxial layer. XTEM measurements detected these polycrystalline phases. In addition, XTEM investigations confirmed also the increase of the lateral crystal size with increasing silicon concentration, as well as a great reduction of the screw dislocation density by more than one order of magnitude as found by X-ray diffraction: in undoped, nitrogen rich grown AlN layers the screw dislocation density is about 3 x 10{sup 8} cm{sup -2}, while AlN layers with a silicon concentration of 5 x 10{sup 20} cm{sup -3} show a screw dislocation density of only 1 x 10{sup 7} cm{sup -2}. In low-doped AlN:Si ([Si]{approx}2 x 10{sup 19} cm{sup -3}) the activation energy of the electronic conductivity is about 250 meV. Increasing the silicon concentration to about 1 x 10{sup 21} cm{sup -3} leads to an increase of the activation energy up to more than 500 meV in the now much more stressed AlN:Si epilayer. Studies of the absorption

  19. Epitaxial Cu{sub 2}ZnSnSe{sub 4} layers by annealing of Sn/Cu/ZnSe(001) precursors on GaAs(001)

    Energy Technology Data Exchange (ETDEWEB)

    Krämmer, Christoph, E-mail: Christoph.Kraemmer@kit.edu [Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe (Germany); Sachs, Johannes [Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe (Germany); Pfaffmann, Lukas [Laboratory for Electron Microscopy, KIT (Germany); Musiol, Timo; Lang, Mario; Gao, Chao [Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe (Germany); Gerthsen, Dagmar [Laboratory for Electron Microscopy, KIT (Germany); Kalt, Heinz [Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe (Germany); Powalla, Michael [Light Technology Institute, KIT (Germany); Zentrum für Sonnenenergie-und Wasserstoff-Forschung Baden-Württemberg (ZSW), 70565 Stuttgart (Germany); Hetterich, Michael [Institute of Applied Physics, Karlsruhe Institute of Technology (KIT), 76131 Karlsruhe (Germany)

    2015-05-01

    We report on the fabrication of epitaxial Cu{sub 2}ZnSnSe{sub 4} films by a two-step fabrication approach. An epitaxial ZnSe(001) layer on GaAs(001) is grown by molecular-beam epitaxy followed by sequential deposition of Cu and Sn. The Sn/Cu/ZnSe(001) precursor is then thermally annealed in a selenium atmosphere. Raman spectroscopy confirms the presence of the kesterite phase. Electron microscopy shows that the films exhibit monocrystalline regions of several micrometers in size with inclusions of smaller grains with a different chemical composition. The latter is confirmed by electron backscatter diffraction measurements which prove the conservation of the crystal orientation defined by the cubic ZnSe/GaAs(001) precursor structure throughout the whole CZTSe film. - Highlights: • Two-step fabrication approach to obtain epitaxial kesterite layers is presented. • Kesterite phase formation is confirmed by Raman spectroscopy. • SnSe{sub x} compounds are identified to be the main secondary phase. • Electron backscatter diffraction proves epitaxial orientation of the films.

  20. Epitaxial Cu2ZnSnSe4 layers by annealing of Sn/Cu/ZnSe(001) precursors on GaAs(001)

    International Nuclear Information System (INIS)

    We report on the fabrication of epitaxial Cu2ZnSnSe4 films by a two-step fabrication approach. An epitaxial ZnSe(001) layer on GaAs(001) is grown by molecular-beam epitaxy followed by sequential deposition of Cu and Sn. The Sn/Cu/ZnSe(001) precursor is then thermally annealed in a selenium atmosphere. Raman spectroscopy confirms the presence of the kesterite phase. Electron microscopy shows that the films exhibit monocrystalline regions of several micrometers in size with inclusions of smaller grains with a different chemical composition. The latter is confirmed by electron backscatter diffraction measurements which prove the conservation of the crystal orientation defined by the cubic ZnSe/GaAs(001) precursor structure throughout the whole CZTSe film. - Highlights: • Two-step fabrication approach to obtain epitaxial kesterite layers is presented. • Kesterite phase formation is confirmed by Raman spectroscopy. • SnSex compounds are identified to be the main secondary phase. • Electron backscatter diffraction proves epitaxial orientation of the films

  1. Growth optimization and applicability of thick on-axis SiC layers using sublimation epitaxy in vacuum

    Science.gov (United States)

    Jokubavicius, Valdas; Sun, Jianwu; Liu, Xinyu; Yazdi, Gholamreza; Ivanov, Ivan. G.; Yakimova, Rositsa; Syväjärvi, Mikael

    2016-08-01

    We demonstrate growth of thick SiC layers (100-200 μm) on nominally on-axis hexagonal substrates using sublimation epitaxy in vacuum (10-5 mbar) at temperatures varying from 1700 to 1975 °C with growth rates up to 270 μm/h and 70 μm/h for 6H- and 4H-SiC, respectively. The stability of hexagonal polytypes are related to process growth parameters and temperature profile which can be engineered using different thermal insulation materials and adjustment of the induction coil position with respect to the graphite crucible. We show that there exists a range of growth rates for which single-hexagonal polytype free of foreign polytype inclusions can be maintained. Further on, foreign polytypes like 3C-SiC can be stabilized by moving out of the process window. The applicability of on-axis growth is demonstrated by growing a 200 μm thick homoepitaxial 6H-SiC layer co-doped with nitrogen and boron in a range of 1018 cm-3 at a growth rate of about 270 μm/h. Such layers are of interest as a near UV to visible light converters in a monolithic white light emitting diode concept, where subsequent nitride-stack growth benefits from the on-axis orientation of the SiC layer.

  2. Substrate Structures For Growth Of Highly Oriented And/Or Epitaxial Layers Thereon

    Energy Technology Data Exchange (ETDEWEB)

    Arendt, Paul N. (Los Alamos, NM); Foltyn, Stephen R. (Los Alamos, NM); Groves, James R. (Los Alamos, NM); Jia, Quanxi (Los Alamos, NM)

    2005-07-26

    A composite substrate structure including a substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the substrate, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer is provided together with additional layers such as one or more layers of a buffer material upon the oriented cubic oxide material layer. Jc's of 2.3×106 A/cm2 have been demonstrated with projected Ic's of 320 Amperes across a sample 1 cm wide for a superconducting article including a flexible polycrystalline metallic substrate, an inert oxide material layer upon the surface of the flexible polycrystalline metallic substrate, a layer of a crystalline metal oxide or crystalline metal oxynitride material upon the layer of the inert oxide material, a layer of an oriented cubic oxide material having a rock-salt-like structure upon the crystalline metal oxide or crystalline metal oxynitride material layer, a layer of a buffer material upon the oriented cubic oxide material layer, and, a top-layer of a high temperature superconducting material upon the layer of a buffer material.

  3. Epitaxial synthesis of diamond layers on a monocrystalline diamond substrate in a torch microwave plasmatron

    International Nuclear Information System (INIS)

    The epitaxial growth of a diamond single-crystal film in a torch microwave discharge excited by a magnetron of a domestic microwave oven with the power of ≤1 kW in an argon-hydrogen-methane mixture with a high concentration of methane (up to 25% with respect to hydrogen) at atmospheric pressure on a sub-strate of a synthetic diamond single crystal (HPHP) with the orientation (100) and 4 × 4 mm in size is obtained. A discharge with the torch diameter of ∼2 mm and the concentration of the microwave power absorbed in the torch volume of >103 W/cm3 is shown to be effective for epitaxial enlargement of a single crystal of synthetic diamond. The structure of the deposited film with the thickness up to 10 μm with high-quality morphology is investigated with an optical microscope as well as using the methods of the Raman scattering and scanning electron microscopy.

  4. Characterization of the carrot defect in 4H-SiC epitaxial layers

    Science.gov (United States)

    Hassan, J.; Henry, A.; McNally, P. J.; Bergman, J. P.

    2010-05-01

    Characterization of the epitaxial defect known as the carrot defect was performed in thick 4H-SiC epilayers. A large number of carrot defects have been studied using different experimental techniques such as Nomarski optical microscopy, KOH etching, cathodoluminescence and synchrotron white beam X-ray topography. This has revealed that carrot defects appear in many different shapes and structures in the epilayers. Our results support the previous assignment of the carrot defect as related to a prismatic stacking fault. However, we have observed carrot defects with and without a visible threading dislocation related etch pit in the head region, after KOH etching. Polishing of epilayers in a few μm steps in combination with etching in molten KOH and imaging using Nomarski optical microscope has been used to find the geometry and origin of the carrot defects in different epilayers. The defects were found to originate both at the epi-substrate interface and during the epitaxial growth. Different sources of the carrot defect have been observed at the epi-substrate interface, which result in different structures and surfaces appearance of the defect in the epilayer. Furthermore, termination of the carrot defect inside the epilayer and the influence of substrate surface damage and growth conditions on the density of carrot defects are studied.

  5. A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

    Energy Technology Data Exchange (ETDEWEB)

    Klug, Jeffrey A., E-mail: jklug@anl.gov; Emery, Jonathan D.; Martinson, Alex B. F.; Proslier, Thomas, E-mail: prolier@anl.gov [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States); Weimer, Matthew S. [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States); Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616 (United States); Yanguas-Gil, Angel; Elam, Jeffrey W. [Energy Systems Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States); Seifert, Sönke; Schlepütz, Christian M. [X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States); Hock, Adam S. [Department of Chemistry, Illinois Institute of Technology, Chicago, Illinois 60616 (United States); Chemical Science and Engineering Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States)

    2015-11-15

    Synchrotron characterization techniques provide some of the most powerful tools for the study of film structure and chemistry. The brilliance and tunability of the Advanced Photon Source allow access to scattering and spectroscopic techniques unavailable with in-house laboratory setups and provide the opportunity to probe various atomic layer deposition (ALD) processes in situ starting at the very first deposition cycle. Here, we present the design and implementation of a portable ALD instrument which possesses a modular reactor scheme that enables simple experimental switchover between various beamlines and characterization techniques. As first examples, we present in situ results for (1) X-ray surface scattering and reflectivity measurements of epitaxial ZnO ALD on sapphire, (2) grazing-incidence small angle scattering of MnO nucleation on silicon, and (3) grazing-incidence X-ray absorption spectroscopy of nucleation-regime Er{sub 2}O{sub 3} ALD on amorphous ALD alumina and single crystalline sapphire.

  6. A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

    International Nuclear Information System (INIS)

    Synchrotron characterization techniques provide some of the most powerful tools for the study of film structure and chemistry. The brilliance and tunability of the Advanced Photon Source allow access to scattering and spectroscopic techniques unavailable with in-house laboratory setups and provide the opportunity to probe various atomic layer deposition (ALD) processes in situ starting at the very first deposition cycle. Here, we present the design and implementation of a portable ALD instrument which possesses a modular reactor scheme that enables simple experimental switchover between various beamlines and characterization techniques. As first examples, we present in situ results for (1) X-ray surface scattering and reflectivity measurements of epitaxial ZnO ALD on sapphire, (2) grazing-incidence small angle scattering of MnO nucleation on silicon, and (3) grazing-incidence X-ray absorption spectroscopy of nucleation-regime Er2O3 ALD on amorphous ALD alumina and single crystalline sapphire

  7. A modular reactor design for in situ synchrotron x-ray investigation of atomic layer deposition processes

    Science.gov (United States)

    Klug, Jeffrey A.; Weimer, Matthew S.; Emery, Jonathan D.; Yanguas-Gil, Angel; Seifert, Sönke; Schlepütz, Christian M.; Martinson, Alex B. F.; Elam, Jeffrey W.; Hock, Adam S.; Proslier, Thomas

    2015-11-01

    Synchrotron characterization techniques provide some of the most powerful tools for the study of film structure and chemistry. The brilliance and tunability of the Advanced Photon Source allow access to scattering and spectroscopic techniques unavailable with in-house laboratory setups and provide the opportunity to probe various atomic layer deposition (ALD) processes in situ starting at the very first deposition cycle. Here, we present the design and implementation of a portable ALD instrument which possesses a modular reactor scheme that enables simple experimental switchover between various beamlines and characterization techniques. As first examples, we present in situ results for (1) X-ray surface scattering and reflectivity measurements of epitaxial ZnO ALD on sapphire, (2) grazing-incidence small angle scattering of MnO nucleation on silicon, and (3) grazing-incidence X-ray absorption spectroscopy of nucleation-regime Er2O3 ALD on amorphous ALD alumina and single crystalline sapphire.

  8. Damage evaluation in graphene underlying atomic layer deposition dielectrics.

    Science.gov (United States)

    Tang, Xiaohui; Reckinger, Nicolas; Poncelet, Olivier; Louette, Pierre; Ureña, Ferran; Idrissi, Hosni; Turner, Stuart; Cabosart, Damien; Colomer, Jean-François; Raskin, Jean-Pierre; Hackens, Benoit; Francis, Laurent A

    2015-08-27

    Based on micro-Raman spectroscopy (μRS) and X-ray photoelectron spectroscopy (XPS), we study the structural damage incurred in monolayer (1L) and few-layer (FL) graphene subjected to atomic-layer deposition of HfO2 and Al2O3 upon different oxygen plasma power levels. We evaluate the damage level and the influence of the HfO2 thickness on graphene. The results indicate that in the case of Al2O3/graphene, whether 1L or FL graphene is strongly damaged under our process conditions. For the case of HfO2/graphene, μRS analysis clearly shows that FL graphene is less disordered than 1L graphene. In addition, the damage levels in FL graphene decrease with the number of layers. Moreover, the FL graphene damage is inversely proportional to the thickness of HfO2 film. Particularly, the bottom layer of twisted bilayer (t-2L) has the salient features of 1L graphene. Therefore, FL graphene allows for controlling/limiting the degree of defect during the PE-ALD HfO2 of dielectrics and could be a good starting material for building field effect transistors, sensors, touch screens and solar cells. Besides, the formation of Hf-C bonds may favor growing high-quality and uniform-coverage dielectric. HfO2 could be a suitable high-K gate dielectric with a scaling capability down to sub-5-nm for graphene-based transistors.

  9. Microstructural characterisation of epitaxial rare earth metal based films

    International Nuclear Information System (INIS)

    Epitaxial rare earth films and superlattices grown by molecular beam epitaxy, MBE, can be designed to investigate theoretical predictions of the magnetic and electronic properties of the metals. These investigations ideally require smooth epitaxial layers with atomically flat interfaces and therefore the microstructure of selected epitaxial rare earth systems has been characterised by a combination of techniques. These systems were grown on a (110) niobium parallel (112-bar0) sapphire substrate. Because the crystallographic quality of the subsequent layers is influenced by the quality of the substrate, the niobium-sapphire interface was studied with transmission electron microscopy, TEM, and high resolution electron microscopy, HREM, to identify uniquely the misfit dislocation network. Conventional TEM specimen preparation techniques were inappropriate for the preparation of metallic foils, and so appropriate specimen preparation techniques were developed. HREM was used to characterise the strain relief mechanisms within a partially relaxed holmium/yttrium superlattice

  10. Structural properties of CdTe-ZnTe strained-layer superlattice grown on GaAs by hot-wall epitaxy

    Science.gov (United States)

    Sugiyama, I.; Hobbs, A.; Ueda, O.; Shinohara, K.; Takigawa, H.

    1991-06-01

    CdTe-ZnTe strained-layer superlattices (SLSs) were grown on GaAs by hot-wall epitaxy. The individual layer thickness of the SLS is well controlled and the thickness fluctuation is less than ±1 monolayer. High-resolution transmission electron microscopy images show coherent SLS growth. We found that two-thirds of the threading dislocations can be reduced by inserting the SLS in CdTe/GaAs.

  11. Structural properties of maskless epitaxial lateral overgrown MOCVD GaN layers on Si (1 1 1) substrates

    Science.gov (United States)

    Haffouz, S.; Grzegorczyk, A.; Hageman, P. R.; Vennégu≐s, P.; van der Drift, E. W. J. M.; Larsen, P. K.

    2003-02-01

    We report on the maskless epitaxial lateral overgrowth of GaN on structured Si (1 1 1) substrates and on its structural properties using transmission electron microscopy and photo-electrochemical (PEC) etching techniques. The structured silicon substrates are achieved using photolithography and dry etching; 4-μm-deep holes of 1.5 μm in diameter, each separated by 2.5 μm, are etched in the (1 1 1) Si surface. The growth process is started by depositing a 10-nm-thick AlN buffer layer at 850°C and then followed by the growth at high temperature (1170°C) of the GaN epilayer. The deposition of GaN takes place first on the Si (1 1 1) surface covered with AlN in between the holes, i.e. no deposits are formed in the holes. During the growth the GaN layer extends vertically and laterally over the holes until complete coalescence. Transmission electron microscopy shows that regions over the holes only contain dislocations in the basal plane resulting from the bending of dislocations nucleated at the Si/AlN interface and at the coalescence boundary between the two laterally overgrown layers. This results in a drastic decrease of dislocation density in these areas of the films. The revelation of dislocations is also achieved by PEC etching technique.

  12. Oxygen-free atomic layer deposition of indium sulfide

    Science.gov (United States)

    Martinson, Alex B.; Hock, Adam S.; McCarthy, Robert; Weimer, Matthew S.

    2016-07-05

    A method for synthesizing an In(III) N,N'-diisopropylacetamidinate precursor including cooling a mixture comprised of diisopropylcarbodiimide and diethyl ether to approximately -30.degree. C., adding methyllithium drop-wise into the mixture, allowing the mixture to warm to room temperature, adding indium(III) chloride as a solid to the mixture to produce a white solid, dissolving the white solid in pentane to form a clear and colorless solution, filtering the mixture over a celite plug, and evaporating the solution under reduced pressure to obtain a solid In(III) N,N'-diisopropylacetamidinate precursor. This precursor has been further used to develop a novel atomic layer deposition technique for indium sulfide by dosing a reactor with the precursor, purging with nitrogen, dosing with dilute hydrogen sulfide, purging again with nitrogen, and repeating these steps to increase growth.

  13. Highly reflective polymeric substrates functionalized utilizing atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Zuzuarregui, Ana, E-mail: a.zuzuarregui@nanogune.eu; Gregorczyk, Keith E. [CIC Nanogune Consolider, de Tolosa Hiribidea 76, 20018 San Sebastián (Spain); Coto, Borja; Ruiz de Gopegui, Unai; Barriga, Javier [IK4-Tekniker, Iñaki Goenaga 5, 20600 Eibar (Spain); Rodríguez, Jorge [Torresol Energy (SENER Group), Avda. de Zugazarte 61, 48930 Las Arenas (Spain); Knez, Mato [CIC Nanogune Consolider, de Tolosa Hiribidea 76, 20018 San Sebastián (Spain); IKERBASQUE Basque Foundation for Science, Maria Diaz de Haro 3, 48013 Bilbao (Spain)

    2015-08-10

    Reflective surfaces are one of the key elements of solar plants to concentrate energy in the receivers of solar thermal electricity plants. Polymeric substrates are being considered as an alternative to the widely used glass mirrors due to their intrinsic and processing advantages, but optimizing both the reflectance and the physical stability of polymeric mirrors still poses technological difficulties. In this work, polymeric surfaces have been functionalized with ceramic thin-films by atomic layer deposition. The characterization and optimization of the parameters involved in the process resulted in surfaces with a reflection index of 97%, turning polymers into a real alternative to glass substrates. The solution we present here can be easily applied in further technological areas where seemingly incompatible combinations of polymeric substrates and ceramic coatings occur.

  14. Production of fractional atomic layer standards of niobium and vanadium

    International Nuclear Information System (INIS)

    To produce such standards a modified Pierce-type electron-beam-gun evaporation system with a thickness monitor was used. An ''accurate'' Nb standard of 0.1 monolayer deposit thickness was prepared by evaporation under controlled conditions. Nb standards of 1.1 q, 0.11, and 0.011 monolayers were produced in a single evaporation. These standards were then calibrated to the ''accurate'' standard. The errors quoted do not include those associated with the monitor itself. The relative accuracy of the standards was verified by Rutherford backscattering and ion micro-probe measurements. Standards of Nb and V on single-crystal Si substrates were produced. The very thin fractional-atomic-layer targets were used in an experiment which yielded valuable information for the fusion power program. This experiment is briefly described. The method of fabrication of the targets, and the techniques used to determine the target thicknesses are described

  15. Atomic layer deposition overcoating: tuning catalyst selectivity for biomass conversion.

    Science.gov (United States)

    Zhang, Hongbo; Gu, Xiang-Kui; Canlas, Christian; Kropf, A Jeremy; Aich, Payoli; Greeley, Jeffrey P; Elam, Jeffrey W; Meyers, Randall J; Dumesic, James A; Stair, Peter C; Marshall, Christopher L

    2014-11-01

    The terraces, edges, and facets of nanoparticles are all active sites for heterogeneous catalysis. These different active sites may cause the formation of various products during the catalytic reaction. Here we report that the step sites of Pd nanoparticles (NPs) can be covered precisely by the atomic layer deposition (ALD) method, whereas the terrace sites remain as active component for the hydrogenation of furfural. Increasing the thickness of the ALD-generated overcoats restricts the adsorption of furfural onto the step sites of Pd NPs and increases the selectivity to furan. Furan selectivities and furfural conversions are linearly correlated for samples with or without an overcoating, though the slopes differ. The ALD technique can tune the selectivity of furfural hydrogenation over Pd NPs and has improved our understanding of the reaction mechanism. The above conclusions are further supported by density functional theory (DFT) calculations.

  16. Oxygen-free atomic layer deposition of indium sulfide

    Energy Technology Data Exchange (ETDEWEB)

    Martinson, Alex B.; Hock, Adam S.; McCarthy, Robert; Weimer, Matthew S.

    2016-07-05

    A method for synthesizing an In(III) N,N'-diisopropylacetamidinate precursor including cooling a mixture comprised of diisopropylcarbodiimide and diethyl ether to approximately -30.degree. C., adding methyllithium drop-wise into the mixture, allowing the mixture to warm to room temperature, adding indium(III) chloride as a solid to the mixture to produce a white solid, dissolving the white solid in pentane to form a clear and colorless solution, filtering the mixture over a celite plug, and evaporating the solution under reduced pressure to obtain a solid In(III) N,N'-diisopropylacetamidinate precursor. This precursor has been further used to develop a novel atomic layer deposition technique for indium sulfide by dosing a reactor with the precursor, purging with nitrogen, dosing with dilute hydrogen sulfide, purging again with nitrogen, and repeating these steps to increase growth.

  17. Contactless monitoring of Ge content and B concentration in ultrathin single and double layer Si1-xGex epitaxial films using multiwavelength micro-Raman spectroscopy

    Directory of Open Access Journals (Sweden)

    Chun-Wei Chang

    2012-03-01

    Full Text Available Non-contact monitoring of Ge content and B concentration in single and double Si1-xGex epitaxial layers on Si(100 device wafers was attempted using high-resolution, multiwavelength micro-Raman spectroscopy. The Ge content and B concentration determined by secondary ion mass spectroscopy (SIMS depth profiling showed very strong correlation with the position and full-width-at-half-maximum of the Si-Si peak from the Si1-xGex epitaxial layers as determined by Raman measurements. High resolution X-ray diffraction (HRXRD characterization was done for all wafers to determine Ge and B sensitivity and form comparisons with Raman and SIMS analysis. The non-destructive, in-line monitoring of Ge content and B concentration of single and double Si1-xGex epitaxial layers with thickness ranging from 5 ∼ 120 nm, on small area monitoring pads, was successfully demonstrated by multiwavelength micro-Raman spectroscopy during epitaxial process optimization, material property verification, and quality control applications.

  18. Atomic layer deposition of TiO{sub 2}

    Energy Technology Data Exchange (ETDEWEB)

    Tallarida, Massimo; Dessmann, Nils; Staedter, Matthias; Friedrich, Daniel; Michling, Marcel; Schmeisser, Dieter [BTU-Cottbus, Konrad-Wachsmann-Allee 17, 03046 Cottbus (Germany)

    2011-07-01

    We present a study of the initial growth of TiO{sub 2} on Si(111) by atomic layer deposition (ALD). The Si substrate was etched with NH{sub 4}F before ALD to remove the native oxide film and to produce a Si-H termination. In-situ experiments by means of photoemission and X-ray absorption spectroscopy were conducted with synchrotron radiation on Ti-oxide films produced using Ti-tetra-iso-propoxide (TTIP) and water as precursors. O 1s, Ti 2p, C 1s, and S i2p core level, and O 1s and Ti 2p absorption edges show the transition of the Ti-oxide properties during the first layers. The growth starts with a very small growth rate (0.03 nm/cycle) due to the growth inhibition of the Si-H termination and proceeds with higher growth rate (0.1 nm/cycle) after 1.5 nm Ti-oxide has been deposited.

  19. Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Materials.

    Science.gov (United States)

    Stefik, Morgan

    2016-07-01

    The fabrication of porous nanocomposites is key to the advancement of energy conversion and storage devices that interface with electrolytes. Bismuth vanadate, BiVO4 , is a promising oxide for solar water splitting where the controlled fabrication of BiVO4 layers within porous, conducting scaffolds has remained a challenge. Here, the atomic layer deposition of bismuth vanadates is reported from BiPh3 , vanadium(V) oxytriisopropoxide, and water. The resulting films have tunable stoichiometry and may be crystallized to form the photoactive scheelite structure of BiVO4 . A selective etching process was used with vanadium-rich depositions to enable the synthesis of phase-pure BiVO4 after spinodal decomposition. BiVO4 thin films were measured for photoelectrochemical performance under AM 1.5 illumination. The average photocurrents were 1.17 mA cm(-2) at 1.23 V versus the reversible hydrogen electrode using a hole-scavenging sulfite electrolyte. The capability to deposit conformal bismuth vanadates will enable a new generation of nanocomposite architectures for solar water splitting. PMID:27246652

  20. Very high frequency plasma reactant for atomic layer deposition

    Science.gov (United States)

    Oh, Il-Kwon; Yoo, Gilsang; Yoon, Chang Mo; Kim, Tae Hyung; Yeom, Geun Young; Kim, Kangsik; Lee, Zonghoon; Jung, Hanearl; Lee, Chang Wan; Kim, Hyungjun; Lee, Han-Bo-Ram

    2016-11-01

    Although plasma-enhanced atomic layer deposition (PE-ALD) results in several benefits in the formation of high-k dielectrics, including a low processing temperature and improved film properties compared to conventional thermal ALD, energetic radicals and ions in the plasma cause damage to layer stacks, leading to the deterioration of electrical properties. In this study, the growth characteristics and film properties of PE-ALD Al2O3 were investigated using a very-high-frequency (VHF) plasma reactant. Because VHF plasma features a lower electron temperature and higher plasma density than conventional radio frequency (RF) plasma, it has a larger number of less energetic reaction species, such as radicals and ions. VHF PE-ALD Al2O3 shows superior physical and electrical properties over RF PE-ALD Al2O3, including high growth per cycle, excellent conformality, low roughness, high dielectric constant, low leakage current, and low interface trap density. In addition, interlayer-free Al2O3 on Si was achieved in VHF PE-ALD via a significant reduction in plasma damage. VHF PE-ALD will be an essential process to realize nanoscale devices that require precise control of interfaces and electrical properties.

  1. Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Materials.

    Science.gov (United States)

    Stefik, Morgan

    2016-07-01

    The fabrication of porous nanocomposites is key to the advancement of energy conversion and storage devices that interface with electrolytes. Bismuth vanadate, BiVO4 , is a promising oxide for solar water splitting where the controlled fabrication of BiVO4 layers within porous, conducting scaffolds has remained a challenge. Here, the atomic layer deposition of bismuth vanadates is reported from BiPh3 , vanadium(V) oxytriisopropoxide, and water. The resulting films have tunable stoichiometry and may be crystallized to form the photoactive scheelite structure of BiVO4 . A selective etching process was used with vanadium-rich depositions to enable the synthesis of phase-pure BiVO4 after spinodal decomposition. BiVO4 thin films were measured for photoelectrochemical performance under AM 1.5 illumination. The average photocurrents were 1.17 mA cm(-2) at 1.23 V versus the reversible hydrogen electrode using a hole-scavenging sulfite electrolyte. The capability to deposit conformal bismuth vanadates will enable a new generation of nanocomposite architectures for solar water splitting.

  2. Atomic Layer Deposition to Enable the Production, Optimization and Protection of Spaceflight Hardware Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Atomic Layer Deposition (ALD) is a cost effective nano-manufacturing technique that allows for the conformal coating of substrates with atomic control in a benign...

  3. Comparative study of single InGaN layers grown on Si(111) and GaN(0001) templates: The role of surface wetting and epitaxial constraint

    Science.gov (United States)

    Gómez, V. J.; Gačević, Ž.; Soto-Rodríguez, P. E. D.; Aseev, P.; Nötzel, R.; Calleja, E.; Sánchez-García, M. A.

    2016-08-01

    This work presents a comparative study, based mainly on X-ray diffraction analysis, of compact (~100 nm thick) and uniform single crystal InGaN layers (In content good surface "wetting" and consequent 2D nucleation. All studied InGaN layers show single epitaxial relationship to both Si(111) and GaN(0001)-on-sapphire substrates as well as a relatively good compositional uniformity (no trace of InGaN phase separation). However, layers grown on Si show significantly lower strain and inferior crystallographic uniformity i.e. higher disorder in crystallographic tilt and twist. The surface "wetting" (poor vs. good) and epitaxial constraint (weak vs. strong) are suggested as the main origins of these discrepancies.

  4. Arsenic-doped high-resistivity-silicon epitaxial layers for integrating low-capacitance diodes

    NARCIS (Netherlands)

    Sakic, A.; Scholtes, T.L.M.; De Boer, W.B.; Golshani, N.; Derakhshandeh, J.; Nanver, L.K.

    2011-01-01

    An arsenic doping technique for depositing up to 40-μm-thick high-resistivity layers is presented for fabricating diodes with low RC constants that can be integrated in closely-packed configurations. The doping of the as-grown epi-layers is controlled down to 5 × 1011 cm−3, a value that is solely li

  5. Strain-induced single-domain growth of epitaxial SrRuO3 layers on SrTiO3: A high-temperature x-ray diffraction study

    NARCIS (Netherlands)

    Vailionis, Arturas; Siemons, Wolter; Koster, Gertjan

    2007-01-01

    Temperature dependent structural phase transitions of SrRuO3 thin films epitaxially grown on SrTiO3(001) single crystal substrates have been studied using high-resolution x-ray diffraction. In contrast to bulk SrRuO3, coherently strained epitaxial layers do not display cubic symmetry up to ∼ 730 °C

  6. Direct atomic-scale observation of layer-by-layer oxide growth during magnesium oxidation

    International Nuclear Information System (INIS)

    The atomic-scale oxide growth dynamics are directly revealed by in situ high resolution transmission electron microscopy during the oxidation of Mg surface. The oxidation process is characterized by the layer-by-layer growth of magnesium oxide (MgO) nanocrystal via the adatom process. Consistently, the nucleated MgO crystals exhibit faceted surface morphology as enclosed by (200) lattice planes. It is believed that the relatively lower surface energies of (200) lattice planes should play important roles, governing the growth mechanism. These results facilitate the understanding of the nanoscale oxide growth mechanism that will have an important impact on the development of magnesium or magnesium alloys with improved resistance to oxidation

  7. Direct atomic-scale observation of layer-by-layer oxide growth during magnesium oxidation

    Energy Technology Data Exchange (ETDEWEB)

    Zheng, He; Wu, Shujing; Sheng, Huaping; Liu, Chun; Liu, Yu; Cao, Fan; Zhou, Zhichao; Zhao, Dongshan, E-mail: wang@whu.edu.cn, E-mail: dszhao@whu.edu.cn; Wang, Jianbo, E-mail: wang@whu.edu.cn, E-mail: dszhao@whu.edu.cn [School of Physics and Technology, Center for Electron Microscopy and MOE Key Laboratory of Artificial Micro- and Nano-structures, Wuhan University, Wuhan 430072 (China); Zhao, Xingzhong [School of Physics and Technology, Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, Wuhan University, Wuhan 430072 (China)

    2014-04-07

    The atomic-scale oxide growth dynamics are directly revealed by in situ high resolution transmission electron microscopy during the oxidation of Mg surface. The oxidation process is characterized by the layer-by-layer growth of magnesium oxide (MgO) nanocrystal via the adatom process. Consistently, the nucleated MgO crystals exhibit faceted surface morphology as enclosed by (200) lattice planes. It is believed that the relatively lower surface energies of (200) lattice planes should play important roles, governing the growth mechanism. These results facilitate the understanding of the nanoscale oxide growth mechanism that will have an important impact on the development of magnesium or magnesium alloys with improved resistance to oxidation.

  8. Stress-modified structural and electronic properties of epitaxial MnAs layers on GaAs

    Science.gov (United States)

    Takagaki, Y.; Herrmann, C.; Herfort, J.; Hucho, C.; Friedland, K.-J.

    2008-12-01

    We compare the transport properties in MnAs layers epitaxially grown on GaAs substrates with various orientation relationships, including MnAs(11¯00)/GaAs(001) , MnAs(0001)/GaAs(111), and MnAs(11¯00)/GaAs(111) . Due to the anisotropic abrupt change in the lattice constants at the phase transition between α - and β-MnAs , the phase-transition stress varies over a wide range depending on the c -axis orientation of MnAs. We employ the temperature range of the phase coexistence to evaluate the strength of the stress. The complex Fermi surface of MnAs is found to alter the Hall coefficient remarkably between holelike and electronlike behaviors in spite of rather subtle changes in the band structure by the strain. We also show that enormously strong pinning of domain walls arises in MnAs layers on GaAs(111)B when in-plane and out-of-plane c -axis orientations are simultaneously present.

  9. Room-temperature selective epitaxial growth of CoO (1 1 1) and Co{sub 3}O{sub 4} (1 1 1) thin films with atomic steps by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Matsuda, Akifumi, E-mail: matsuda.a.aa@m.titech.ac.jp [Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502 (Japan); Yamauchi, Ryosuke; Shiojiri, Daishi; Tan, Geng [Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502 (Japan); Kaneko, Satoru [Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502 (Japan); Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435 (Japan); Yoshimoto, Mamoru [Department of Innovative and Engineered Materials, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259-J3-16 Nagatsuta, Midori, Yokohama 226-8502 (Japan)

    2015-09-15

    Highlights: • Epitaxial CoO (1 1 1) and Co{sub 3}O{sub 4} (1 1 1) thin films were grown at room temperature (RT). • The CoO and Co{sub 3}O{sub 4} phases were selectively epitaxied by modifying the O{sub 2} atmosphere. • Ultra-smooth surfaces were obtained on the thin films suppressing grain coarsening. • Effect of RT-epitaxy on structures of the films such as lattice strain is presented. • Optical bandgaps consistent with past reports were obtained even by the growth at RT. - Abstract: Cobalt oxide epitaxial thin films of both rock-salt CoO and spinel Co{sub 3}O{sub 4} were selectively synthesized on atomically stepped α-Al{sub 2}O{sub 3} (0 0 0 1) substrates at room temperature under well-controlled oxygen pressures by pulsed laser deposition. X-ray diffraction and reflection high-energy electron diffraction analyses demonstrated that the CoO and Co{sub 3}O{sub 4} films were grown with phase control and good epitaxial quality at room temperature (20 °C). The CoO (1 1 1) film was obtained in ultra-high vacuum of 1 × 10{sup −8} Torr, while the Co{sub 3}O{sub 4} (1 1 1) film was grown in 1 × 10{sup −2} Torr of O{sub 2}. X-ray reciprocal space mapping results indicated that the in-plane mismatches of the {1 = 10} planes of CoO (1 1 1) and Co{sub 3}O{sub 4} (1 1 1) films with the substrate were 4.5% and 2.5%, respectively. The films were almost entirely relaxed with ratios of expansion less than ±2%; the films underwent slight elongation along the [1 1 1] axis and shrinkage in the (1 1 1) plane. The surfaces of the as-grown CoO and Co{sub 3}O{sub 4} thin films revealed atomic steps reflective of those on the substrates. Their root-mean-square roughness values were about 0.1 nm indicating suppressed grain growth on the substrates at room temperature. The optical bandgap of the epitaxial CoO (1 1 1) film was estimated to be 2.72 eV accompanied with a broad absorption attributable to non-stoichiometry or d-d transition. The bandgap of the Co{sub 3}O

  10. Si(111)衬底上多层石墨烯薄膜的外延生长%Epitaxial Growth of Multi-layer Graphene on the Substrate of Si(111)

    Institute of Scientific and Technical Information of China (English)

    李利民; 唐军; 康朝阳; 潘国强; 闫文盛; 韦世强; 徐彭寿

    2011-01-01

    Graphene thin films were epitaxial grown on Si(111) substrates by depositing carbon atoms with solid source molecular beam epitaxy (SSMBE). The structural properties of the samples deposited at different substrate temperature (400, 600, 700 and 800℃) were investigated by reflection high energy electron diffraction (RHEED),Fourier transform infrared spectroscope (FTIR), Raman spectroscope (RAMAN) and near-edge X-ray absorption fine-structure (NEXAFS). RAMAN and NEXAFS results indicated that the thin film deposited at 800℃ exhibited the characteristic of graphene, while the thin films deposited at 400℃, 600℃ and 700℃ were attributed to amorphous or polycrystalline carbon thin films. RHEED and FTIR results indicated that C atoms did not bond with Si atoms at the substrate temperature below 600℃, however, above 700℃, C atoms reacted with Si atoms and formed the SiC buffer layer. Furthermore, the better quality of SiC buffer layer could be obtained at 800℃. Thus, high substrate temperature and high-quality SiC buffer layers are essential to the formation of the graphene layers on the Si substrates.%利用固源分子束外延(SSMBE)技术,在Si(111)衬底上沉积碳原子外延生长石墨烯薄膜,通过反射式高能电子衍射(RHEED)、红外吸收谱(FTIR)、拉曼光谱(RAMAN)和X射线吸收精细结构谱(NEXAFS)等手段对不同衬底温度(400、600、700、800℃)生长的薄膜进行结构表征.RAMAN和NEXAFS结果表明:在800℃下制备的薄膜具有石墨烯的特征,而400、600和700℃生长的样品为非晶或多晶碳薄膜.RHEED和FTIR结果表明,沉积温度在600℃以下时C原子和衬底Si原子没有成键,而衬底温度提升到700℃以上,沉积的C原子会先和衬底Si原子反应形成SiC缓冲层,且在800℃沉积时缓冲层质量较好.因此在Si衬底上制备石墨烯薄膜需要较高的衬底温度和高质量的SiC缓冲层.

  11. Layer by layer removal of Au atoms from passivated Au(111) surfaces using the scanning tunneling microscope: Nanoscale ``paint stripping''

    Science.gov (United States)

    Keel, J. M.; Yin, J.; Guo, Q.; Palmer, R. E.

    2002-04-01

    Layer by layer removal of gold atoms from the (111) surface of gold has been performed using the scanning tunneling microscope. The process is made possible by a chemisorbed self-assembled monolayer (SAM) of dodecanethiol molecules on the surface, which gives rise to a reduced bonding strength between the top two layers of gold atoms. The gold atoms and associated adsorbed molecules are peeled off and displaced laterally by the STM tip, and the size of the modified area (down to ˜10×10 nm) is more or less determined by the scan size.

  12. CMUTs with high-K atomic layer deposition dielectric material insulation layer.

    Science.gov (United States)

    Xu, Toby; Tekes, Coskun; Degertekin, F

    2014-12-01

    Use of high-κ dielectric, atomic layer deposition (ALD) materials as an insulation layer material for capacitive micromachined ultrasonic transducers (CMUTs) is investigated. The effect of insulation layer material and thickness on CMUT performance is evaluated using a simple parallel plate model. The model shows that both high dielectric constant and the electrical breakdown strength are important for the dielectric material, and significant performance improvement can be achieved, especially as the vacuum gap thickness is reduced. In particular, ALD hafnium oxide (HfO2) is evaluated and used as an improvement over plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (Six)Ny)) for CMUTs fabricated by a low-temperature, complementary metal oxide semiconductor transistor-compatible, sacrificial release method. Relevant properties of ALD HfO2) such as dielectric constant and breakdown strength are characterized to further guide CMUT design. Experiments are performed on parallel fabricated test CMUTs with 50-nm gap and 16.5-MHz center frequency to measure and compare pressure output and receive sensitivity for 200-nm PECVD Six)Ny) and 100-nm HfO2) insulation layers. Results for this particular design show a 6-dB improvement in receiver output with the collapse voltage reduced by one-half; while in transmit mode, half the input voltage is needed to achieve the same maximum output pressure. PMID:25474786

  13. The role of defects in fluorescent silicon carbide layers grown by sublimation epitaxy

    DEFF Research Database (Denmark)

    Schimmel, Saskia; Kaiser, Michl; Jokubavicius, Valdas;

    2014-01-01

    short radiative lifetimes, long nonradiative lifetimes are crucial for efficient light conversion. The impact of different types of defects is studied by characterizing fluorescent silicon carbide layers with regard to photoluminescence intensity, homogeneity and efficiency taking into account...

  14. Properties of boron-doped epitaxial diamond layers grown on (110) oriented single crystal substrates

    OpenAIRE

    Mortet, Vincent; Pernot, J.; Jomard, F.; Soltani, A; Remes, Zdenek; Barjon, Julien; D'Haen, J; Haenen, Ken

    2015-01-01

    Boron doped diamond layers have been grown on (110) single crystal diamond substrates with B/C ratios up to 20 ppm in the gas phase. The surface of the diamond layers observed by scanning electron microscopy consists of (100) and (113) micro-facets. Fourier Transform Photocurrent Spectroscopy indicates substitutional boron incorporation. Electrical properties were measured using Hall effect from 150 to 1000 K. Secondary ion mass spectrometry analyses are consistent with the high incorporation...

  15. Microstructural analysis of InGaN/GaN epitaxial layers of metal organic chemical vapor deposition on c-plane of convex patterned sapphire substrate

    International Nuclear Information System (INIS)

    The microstructures of the P-GaN (250 nm)/GaN cap (∼ 35 nm)/7 pairs of InGaN/GaN MQWs (multi-quantum wells)/n-GaN (3 μm)/HT (high temperature)-GaN (3 μm)/LT (low temperature)-GaN buffer (5 nm) on c-plane convex patterned sapphire substrate were analyzed using transmission electron microscopy (TEM). High density of dislocations in the LT-GaN buffer layer at both flat and convex patterned regions was observed to form. At the flat region, some of high dislocations formed at LT-GaN buffer grew over, bended to from stair-like dislocations extended along the edge of the convex pattern and then transformed to TDs (threading dislocations) extending through the InGaN/GaN epitaxial layers. However, few TDs reached the top of the epitaxial layers. Quantitative analysis revealed that the dislocation density has been drastically reduced to ∼ 106 cm−2, reducing formation of V-defects at the 7 pairs of multi-quantum-wells near the surface. - Highlights: • The InGaN/GaN epitaxial layers were grown on convex patterned sapphire substrate. • We systematically study the defect structures by transmission electron microscopy. • Reduce threading dislocation and V defect by growth on convex pattered substrate. • Improving of overall microstructure by growth on convex pattern substrate

  16. HgTe and CdTe epitaxial layers and HgTe–CdTe superlattices grown by laser molecular beam epitaxy

    OpenAIRE

    Cheung, J. T.; Niizawa, G.; Moyle, J.; Ong, N. P.; Paine, B. M.; Vreeland, T., Jr.

    1986-01-01

    CdTe and HgTe epilayers and HgTe/CdTe superlattices have been grown by laser molecular beam epitaxy (laser MBE) on CdTe substrates. The power density of the laser radiation used to evaporate source materials was found to be a very important growth parameter. The superlattice structures have been characterized by helium ion backscattering spectrometry, x-ray double crystal diffractometry, and low temperature electrical transport measurements. Results indicate good crystallinity and very strong...

  17. A modified hot wall epitaxy technique for the growth of CdTe and Hg sub 1-x Cd sub x epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Rogalski, A.; Piotrowski, J. (Inst. of Technical Physics, WAT, Warsaw (Poland)); Gronkowski, J. (Inst. of Experimental Physics, Warsaw Univ. (Poland))

    1990-10-15

    A modified hot wall epitaxy technique has been used for the growth of high quality CdTe epilayers on GaAs substrates. X-ray topographic analysis indicates that these epilayers have device quality crystalline structures. The possibility of growth of Hg{sub 1-x}Cd{sub x}Te epilayers in this deposition system has been demonstrated for the first time. (orig.).

  18. Atomic structure of epitaxial graphene sidewall nanoribbons: flat graphene, miniribbons, and the confinement gap.

    Science.gov (United States)

    Palacio, Irene; Celis, Arlensiú; Nair, Maya N; Gloter, Alexandre; Zobelli, Alberto; Sicot, Muriel; Malterre, Daniel; Nevius, Meredith S; de Heer, Walt A; Berger, Claire; Conrad, Edward H; Taleb-Ibrahimi, Amina; Tejeda, Antonio

    2015-01-14

    Graphene nanoribbons grown on sidewall facets of SiC have demonstrated exceptional quantized ballistic transport up to 15 μm at room temperature. Angular-resolved photoemission spectroscopy (ARPES) has shown that the ribbons have the band structure of charge neutral graphene, while bent regions of the ribbon develop a bandgap. We present scanning tunneling microscopy and transmission electron microscopy of armchair nanoribbons grown on recrystallized sidewall trenches etched in SiC. We show that the nanoribbons consist of a single graphene layer essentially decoupled from the facet surface. The nanoribbons are bordered by 1-2 nm wide bent miniribbons at both the top and bottom edges of the nanoribbons. We establish that nanoscale confinement in the graphene miniribbons is the origin of the local large band gap observed in ARPES. The structural results presented here show how this gap is formed and provide a framework to help understand ballistic transport in sidewall graphene.

  19. Epitaxial B-Graphene: Large-Scale Growth and Atomic Structure.

    Science.gov (United States)

    Usachov, Dmitry Yu; Fedorov, Alexander V; Petukhov, Anatoly E; Vilkov, Oleg Yu; Rybkin, Artem G; Otrokov, Mikhail M; Arnau, Andrés; Chulkov, Evgueni V; Yashina, Lada V; Farjam, Mani; Adamchuk, Vera K; Senkovskiy, Boris V; Laubschat, Clemens; Vyalikh, Denis V

    2015-07-28

    Embedding foreign atoms or molecules in graphene has become the key approach in its functionalization and is intensively used for tuning its structural and electronic properties. Here, we present an efficient method based on chemical vapor deposition for large scale growth of boron-doped graphene (B-graphene) on Ni(111) and Co(0001) substrates using carborane molecules as the precursor. It is shown that up to 19 at. % of boron can be embedded in the graphene matrix and that a planar C-B sp(2) network is formed. It is resistant to air exposure and widely retains the electronic structure of graphene on metals. The large-scale and local structure of this material has been explored depending on boron content and substrate. By resolving individual impurities with scanning tunneling microscopy we have demonstrated the possibility for preferential substitution of carbon with boron in one of the graphene sublattices (unbalanced sublattice doping) at low doping level on the Ni(111) substrate. At high boron content the honeycomb lattice of B-graphene is strongly distorted, and therefore, it demonstrates no unballanced sublattice doping. PMID:26121999

  20. Synthesis of platinum nanoparticle electrocatalysts by atomic layer deposition

    Science.gov (United States)

    Lubers, Alia Marie

    Demand for energy continues to increase, and without alternatives to fossil fuel combustion the effects on our environment will become increasingly severe. Fuel cells offer a promising improvement on current methods of energy generation; they are able to convert hydrogen fuel into electricity with a theoretical efficiency of up to 83% and interface smoothly with renewable hydrogen production. Fuel cells can replace internal combustion engines in vehicles and are used in stationary applications to power homes and businesses. The efficiency of a fuel cell is maximized by its catalyst, which is often composed of platinum nanoparticles supported on carbon. Economical production of fuel cell catalysts will promote adoption of this technology. Atomic layer deposition (ALD) is a possible method for producing catalysts at a large scale when employed in a fluidized bed. ALD relies on sequential dosing of gas-phase precursors to grow a material layer by layer. We have synthesized platinum nanoparticles on a carbon particle support (Pt/C) by ALD for use in proton exchange membrane fuel cells (PEMFCs) and electrochemical hydrogen pumps. Platinum nanoparticles with different characteristics were deposited by changing two chemistries: the carbon substrate through functionalization; and the deposition process by use of either oxygen or hydrogen as ligand removing reactants. The metal depositing reactant was trimethyl(methylcyclopentadienyl)platinum(IV). Functionalizing the carbon substrate increased nucleation during deposition resulting in smaller and more dispersed nanoparticles. Use of hydrogen produced smaller nanoparticles than oxygen, due to a gentler hydrogenation reaction compared to using oxygen's destructive combustion reaction. Synthesized Pt/C materials were used as catalysts in an electrochemical hydrogen pump, a device used to separate hydrogen fuel from contaminants. Catalysts deposited by ALD on functionalized carbon using a hydrogen chemistry were the most

  1. High Gradient Accelerator Cavities Using Atomic Layer Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Ives, Robert Lawrence [Calabazas Creek Research, Inc., San Mateo, CA (United States); Parsons, Gregory [North Carolina State Univ., Raleigh, NC (United States); Williams, Philip [North Carolina State Univ., Raleigh, NC (United States); Oldham, Christopher [North Carolina State Univ., Raleigh, NC (United States); Mundy, Zach [North Carolina State Univ., Raleigh, NC (United States); Dolgashev, Valery [SLAC National Accelerator Lab., Menlo Park, CA (United States)

    2014-12-09

    In the Phase I program, Calabazas Creek Research, Inc. (CCR), in collaboration with North Carolina State University (NCSU), fabricated copper accelerator cavities and used Atomic Layer Deposition (ALD) to apply thin metal coatings of tungsten and platinum. It was hypothesized that a tungsten coating would provide a robust surface more resistant to arcing and arc damage. The platinum coating was predicted to reduce processing time by inhibiting oxides that form on copper surfaces soon after machining. Two sets of cavity parts were fabricated. One was coated with 35 nm of tungsten, and the other with approximately 10 nm of platinum. Only the platinum cavity parts could be high power tested during the Phase I program due to schedule and funding constraints. The platinum coated cavity exhibit poor performance when compared with pure copper cavities. Not only did arcing occur at lower power levels, but the processing time was actually longer. There were several issues that contributed to the poor performance. First, machining of the base copper cavity parts failed to achieve the quality and cleanliness standards specified to SLAC National Accelerator Center. Secondly, the ALD facilities were not configured to provide the high levels of cleanliness required. Finally, the nanometer coating applied was likely far too thin to provide the performance required. The coating was ablated or peeled from the surface in regions of high fields. It was concluded that the current ALD process could not provide improved performance over cavities produced at national laboratories using dedicated facilities.

  2. Hemispherical micro-resonators from atomic layer deposition

    Science.gov (United States)

    Gray, Jason M.; Houlton, John P.; Gertsch, Jonas C.; Brown, Joseph J.; Rogers, Charles T.; George, Steven M.; Bright, Victor M.

    2014-12-01

    Hemispherical shell micro-resonators may be used as gyroscopes to potentially enable precision inertial navigation and guidance at low cost and size. Such devices require a high degree of symmetry and large quality factors (Q). Fabricating the devices from atomic layer deposition (ALD) facilitates symmetry through ALD’s high conformality and low surface roughness. To maximize Q, the shells’ geometry is optimized using finite element method (FEM) studies to reduce thermoelastic dissipation and anchor loss. The shells are fabricated by etching hemispherical molds in Si (1 1 1) substrates with a 2:7:1 volumetric ratio of hydrofluoric:nitric:acetic acids, and conformally coating and patterning the molds with ALD Al2O3. The Al2O3 shells are then released from the surrounding Si substrate with an SF6 plasma. The resulting shells typically have radii around 50 µm and thicknesses close to 50 nm. The shells are highly symmetric, with radial deviations between 0.22 and 0.49%, and robust enough to be driven on resonance at amplitudes 10 × their thickness, sufficient to visualize the resonance mode shapes in an SEM. Resonance frequencies are around 60 kHz, with Q values between 1000 and 2000. This Q is lower than the 106 predicted by FEM, implying that Q is being limited by unmodeled sources of energy loss, most likely from surface effects or material defects.

  3. Continuous production of nanostructured particles using spatial atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Ommen, J. Ruud van, E-mail: j.r.vanommen@tudelft.nl; Kooijman, Dirkjan; Niet, Mark de; Talebi, Mojgan; Goulas, Aristeidis [Department of Chemical Engineering, Delft University of Technology, Julianalaan 136, 2628 BL Delft (Netherlands)

    2015-03-15

    In this paper, the authors demonstrate a novel spatial atomic layer deposition (ALD) process based on pneumatic transport of nanoparticle agglomerates. Nanoclusters of platinum (Pt) of ∼1 nm diameter are deposited onto titania (TiO{sub 2}) P25 nanoparticles resulting to a continuous production of an active photocatalyst (0.12–0.31 wt. % of Pt) at a rate of about 1 g min{sup −1}. Tuning the precursor injection velocity (10–40 m s{sup −1}) enhances the contact between the precursor and the pneumatically transported support flows. Decreasing the chemisorption temperature (from 250 to 100 °C) results in more uniform distribution of the Pt nanoclusters as it decreases the reaction rate as compared to the rate of diffusion into the nanoparticle agglomerates. Utilizing this photocatalyst in the oxidation reaction of Acid Blue 9 showed a factor of five increase of the photocatalytic activity compared to the native P25 nanoparticles. The use of spatial particle ALD can be further expanded to deposition of nanoclusters on porous, micron-sized particles and to the production of core–shell nanoparticles enabling the robust and scalable manufacturing of nanostructured powders for catalysis and other applications.

  4. Aqueous phase synthesis of upconversion nanocrystals through layer-by-layer epitaxial growth for in vivo X-ray computed tomography

    KAUST Repository

    Li, Feifei

    2013-05-21

    Lanthanide-doped core-shell upconversion nanocrystals (UCNCs) have tremendous potential for applications in many fields, especially in bio-imaging and medical therapy. As core-shell UCNCs are mostly synthesized in organic solvents, tedious organic-aqueous phase transfer processes are usually needed for their use in bio-applications. Herein, we demonstrate the first example of one-step synthesis of highly luminescent core-shell UCNCs in the "aqueous" phase under mild conditions using innocuous reagents. A microwave-assisted approach allowed for layer-by-layer epitaxial growth of a hydrophilic NaGdF4 shell on NaYF4:Yb, Er cores. During this process, surface defects of the nanocrystals could be gradually passivated by the homogeneous shell deposition, resulting in obvious enhancement in the overall upconversion emission efficiency. In addition, the up-down conversion dual-mode luminescent NaYF4:Yb, Er@NaGdF4:Ce, Ln (Eu, Tb, Sm, Dy) nanocrystals were also synthesized to further validate the successful formation of the core-shell structure. More significantly, based on their superior solubility and stability in water solution, high upconversion efficiency and Gd-doped predominant X-ray absorption, the as-prepared NaYF4:Yb, Er@NaGdF4 core-shell UCNCs exhibited high contrast in in vitro cell imaging and in vivo X-ray computed tomography (CT) imaging, demonstrating great potential as multiplexed luminescent biolabels and CT contrast agents.

  5. Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

    Science.gov (United States)

    Choudhary, B. S.; Singh, A.; Tanwar, S.; Tyagi, P. K.; Kumar, M. Senthil; Kushvaha, S. S.

    2016-04-01

    We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

  6. The mechanical robustness of atomic-layer- and molecular-layer-deposited coatings on polymer substrates

    Science.gov (United States)

    Miller, David C.; Foster, Ross R.; Zhang, Yadong; Jen, Shih-Hui; Bertrand, Jacob A.; Lu, Zhixing; Seghete, Dragos; O'Patchen, Jennifer L.; Yang, Ronggui; Lee, Yung-Cheng; George, Steven M.; Dunn, Martin L.

    2009-05-01

    The mechanical robustness of atomic layer deposited alumina and recently developed molecular layer deposited aluminum alkoxide ("alucone") films, as well as laminated composite films composed of both materials, was characterized using mechanical tensile tests along with a recently developed fluorescent tag to visualize channel cracks in the transparent films. All coatings were deposited on polyethylene naphthalate substrates and demonstrated a similar evolution of damage morphology according to applied strain, including channel crack initiation, crack propagation at the critical strain, crack densification up to saturation, and transverse crack formation associated with buckling and delamination. From measurements of crack density versus applied tensile strain coupled with a fracture mechanics model, the mode I fracture toughness of alumina and alucone films was determined to be KIC=1.89±0.10 and 0.17±0.02 MPa m0.5, respectively. From measurements of the saturated crack density, the critical interfacial shear stress was estimated to be τc=39.5±8.3 and 66.6±6.1 MPa, respectively. The toughness of nanometer-scale alumina was comparable to that of alumina thin films grown using other techniques, whereas alucone was quite brittle. The use of alucone as a spacer layer between alumina films was not found to increase the critical strain at fracture for the composite films. This performance is attributed to the low toughness of alucone. The experimental results were supported by companion simulations using fracture mechanics formalism for multilayer films. To aid future development, the modeling method was used to study the increase in the toughness and elastic modulus of the spacer layer required to render improved critical strain at fracture. These results may be applied to a broad variety of multilayer material systems composed of ceramic and spacer layers to yield robust coatings for use in chemical barrier and other applications.

  7. GaAs Solar Cells Grown by Hydride Vapor-Phase Epitaxy and the Development of GaInP Cladding Layers

    Energy Technology Data Exchange (ETDEWEB)

    Simon, John; Schulte, Kevin L.; Young, David L.; Haegel, Nancy M.; Ptak, Aaron J.

    2016-01-01

    The high cost of high-efficiency III-V photovoltaic devices currently limits them to niche markets. Hydride vapor-phase epitaxy (HVPE) growth of III-V materials recently reemerged as a low-cost, high-throughput alternative to conventional metal- organic vapor-phase epitaxy (MOVPE) growth of high-efficiency solar cells. Previously, we demonstrated unpassivated HVPEgrown GaAs p-n junctions with good quantum efficiency and high open-circuit voltage (Voc). In this work, we demonstrate the growth of GaInPby HVPE for use as a high-quality surface passivation layer to GaAs solar cells. Solar cells grown with GaInP window layers show significantly improved quantum efficiency compared with unpassivated cells, increasing the short-circuit current (JSC) of these low-cost devices. These results show the potential of low-cost HVPE for the growth of high-quality III-V devices.

  8. Anelasticity of GaN Epitaxial Layer in GaN LED

    Science.gov (United States)

    Chung, C. C.; Yang, C. T.; Liu, C. Y.

    2016-10-01

    In this work, the anelasticity of the GaN layer in the GaN light-emitting-diode device was studied. The present results show that the forward-voltage of GaN LED increases with time, as the GaN light-emitting-diode was maintained at a constant temperature of 100 °C. We found that the increase of the forward-voltage with time attributes to the delay-response of the piezoelectric fields (internal electrical fields in GaN LED device). And, the delay-response of the internal electrical fields with time is caused by the anelasticity (time-dependent strain) of the GaN layer. Therefore, using the correlation of strain-piezoelectric-forward voltage, a plot of thermal strain of the GaN layer against time can be obtained by measuring the forward-voltage of the studied GaN LED against time. With the curves of the thermal strain of GaN epi-layers versus time, the anelasticity of the GaN compound can be studied. The key anelasticity parameter, characteristic relaxation time, of the GaN is defined to be 2623.76 min in this work.

  9. The role of defects in fluorescent silicon carbide layers grown by sublimation epitaxy

    DEFF Research Database (Denmark)

    Schimmel, Saskia; Kaiser, Michl; Jokubavicius, Valdas;

    Donor-acceptor co-doped silicon carbide layers are promising light converters for novel monolithic all-semiconductor LEDs due to their broad-band donor-acceptor pair luminescence and potentially high internal quantum efficiency. Besides appropriate doping concentrations yielding low radiative...

  10. Microscopic potential fluctuations in Si-doped AlGaN epitaxial layers with various AlN molar fractions and Si concentrations

    Energy Technology Data Exchange (ETDEWEB)

    Kurai, Satoshi, E-mail: kurai@yamaguchi-u.ac.jp; Yamada, Yoichi [Department of Material Science and Engineering, Yamaguchi University, 2-16-1 Tokiwadai, Ube, Yamaguchi 755-8611 (Japan); Miyake, Hideto; Hiramatsu, Kazumasa [Department of Electrical and Electronic Engineering, Mie University, 1577 Kurimamachiya, Tsu, Mie 514-8507 (Japan)

    2016-01-14

    Nanoscopic potential fluctuations of Si-doped AlGaN epitaxial layers with the AlN molar fraction varying from 0.42 to 0.95 and Si-doped Al{sub 0.61}Ga{sub 0.39}N epitaxial layers with Si concentrations of 3.0–37 × 10{sup 17 }cm{sup −3} were investigated by cathodoluminescence (CL) imaging combined with scanning electron microscopy. The spot CL linewidths of AlGaN epitaxial layers broadened as the AlN molar fraction was increased to 0.7, and then narrowed at higher AlN molar fractions. The experimental linewidths were compared with the theoretical prediction from the alloy broadening model. The trends displayed by our spot CL linewidths were consistent with calculated results at AlN molar fractions of less than about 0.60, but the spot CL linewidths were markedly broader than the calculated linewidths at higher AlN molar fractions. The dependence of the difference between the spot CL linewidth and calculated line broadening on AlN molar fraction was found to be similar to the dependence of reported S values, indicating that the vacancy clusters acted as the origin of additional line broadening at high AlN molar fractions. The spot CL linewidths of Al{sub 0.61}Ga{sub 0.39}N epitaxial layers with the same Al concentration and different Si concentrations were nearly constant in the entire Si concentration range tested. From the comparison of reported S values, the increase of V{sub Al} did not contribute to the linewidth broadening, unlike the case of the V{sub Al} clusters.

  11. Recombination-current suppression in GaAs p-n junctions grown on AlGaAs buffer layers by molecular-beam epitaxy

    Science.gov (United States)

    Rancour, D. P.; Melloch, M. R.; Pierret, R. F.; Lundstrom, M. S.; Klausmeier-Brown, M. E.; Kyono, C. S.

    1987-08-01

    n+pp+GaAs and n+pP+ GaAs/GaAs/Al0.3Ga0.7As mesa diodes have been fabricated from films grown by molecular-beam epitaxy. The diodes made from films employing an AlGaAs buffer layer show marked improvements (a factor of 5 reduction) in recombination current densities. Deep level transient spectroscopy measurements moreover indicate that deep level concentrations are reduced by the AlGaAs buffer.

  12. GaN layers with different polarities prepared by radio frequency molecular beam epitaxy and characterized by Raman scattering

    Institute of Scientific and Technical Information of China (English)

    Zhong Fei; Li Xin-Hua; Qiu Kai; Yin Zhi-Jun; Ji Chang-Jian; Cao Xian-Cun; Han Qi-Feng; Chen Jia-Rong; Wang Yu-Qi

    2007-01-01

    GaN layers with different polarities have been prepared by radio-frequency molecular beam epitaxy (RF-MBE) and characterized by Raman scattering. Polarity control are realized by controlling Al/N flux ratio during high temperature AlN buffer growth. The Raman results illustrate that the N-polarity GaN films have frequency shifts at A1(LO) mode because of their high carrier density; the forbidden A1 (TO) mode occurs for mixed-polarity GaN films due to the destroyed translation symmetry by inversion domain boundaries (IDBS); Raman spectra for Ga-polarity GaN films show that they have neither frequency shifts mode nor forbidden mode. These results indicate that Ga-polarity GaN films have a better quality, and they are in good agreement with the results obtained from the room temperature Hall mobility. The best values of Ga-polarity GaN films are 1042 cm2/Vs with a carrier density of 1.0×1017 cm-3.

  13. Schottky barrier detectors on 4H-SiC n-type epitaxial layer for alpha particles

    Energy Technology Data Exchange (ETDEWEB)

    Chaudhuri, S.K.; Krishna, R.M.; Zavalla, K.J. [Department of Electrical Engineering, University of South Carolina, Columbia, SC 29208 (United States); Mandal, K.C., E-mail: mandalk@cec.sc.edu [Department of Electrical Engineering, University of South Carolina, Columbia, SC 29208 (United States)

    2013-02-11

    Schottky barrier detectors have been fabricated on 50 μm n-type 4H-SiC epitaxial layers grown on 360 μm SiC substrates by depositing ∼10 nm nickel contact. Current–voltage (I–V) and capacitance–voltage (C–V) measurements were carried out to investigate the Schottky barrier properties. The detectors were evaluated for alpha particle detection using a {sup 241}Am alpha source. An energy resolution of ∼2.7% was obtained with a reverse bias of 100 V for 5.48 MeV alpha particles. The measured charge collection efficiency (CCE) was seen to vary as a function of bias voltage following a minority carrier diffusion model. Using this model, a diffusion length of∼3.5 μm for holes was numerically calculated from the CCE vs. bias voltage plot. Rise-time measurements of digitally recorded charge pulses for the 5.48 MeV alpha particles showed a presence of two sets of events having different rise-times at a higher bias of 200 V. A biparametric correlation scheme was successfully implemented for the first time to visualize the correlated pulse-height distribution of the events with different rise-times. Using the rise-time measurements and the biparametric plots, the observed variation of energy resolution with applied bias was explained.

  14. Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth

    Energy Technology Data Exchange (ETDEWEB)

    Muneshwar, Triratna, E-mail: muneshwa@ualberta.ca; Cadien, Ken [Department of Chemical and Materials Engineering, University of Alberta, Edmonton, Alberta T6G 2V4 (Canada)

    2015-11-15

    Atomic layer deposition (ALD) relies on a sequence of self-limiting surface reactions for thin film growth. The effect of non-ALD side reactions, from insufficient purging between pulses and from precursor self-decomposition, on film growth is well known. In this article, precursor condensation within an ALD valve is described, and the effect of the continuous precursor source from condensate evaporation on ALD growth is discussed. The influence of the ALD valve temperature on growth and electrical resistivity of ZrN plasma enhanced ALD (PEALD) films is reported. Increasing ALD valve temperature from 75 to 95 °C, with other process parameters being identical, decreased both the growth per cycle and electrical resistivity (ρ) of ZrN PEALD films from 0.10 to 0.07 nm/cycle and from 560 to 350 μΩ cm, respectively. Our results show that the non-ALD growth resulting from condensate accumulation is eliminated at valve temperatures close to the pressure corrected boiling point of precursor.

  15. Multilayer epitaxial growth of lead phthalocyanine and C(70) using CuBr as a templating layer for enhancing the efficiency of organic photovoltaic cells.

    Science.gov (United States)

    Kim, Tae-Min; Shim, Hyun-Sub; Choi, Min-Soo; Kim, Hyo Jung; Kim, Jang-Joo

    2014-03-26

    The molecular orientation and crystallinity of donor and acceptor molecules are important for high-efficiency organic photovoltaic cells (OPVs) because they significantly influence both the absorption of light and charge-transport characteristics. We report that the templating effect extends to multilayers to increase the crystallinity and to modify the orientation of the crystals of lead phthalocyanine (PbPc) and C70 layers at the same time by adopting CuBr as a new templating layer on indium tin oxide (ITO). The formation of a monoclinic phase with a preferred orientation of (320) for PbPc and a fcc phase with a preferred orientation of (220) for C70 on the PbPc layer is revealed by X-ray diffraction (XRD) patterns. The multilayer epitaxy results in an increase of the exciton diffusion lengths from 5.6 to 8.8 nm for PbPc and from 6.9 to 13.8 nm for C70 to enhance the power conversion efficiency (PCE) of the planar heterojunction OPVs composed of PbPc and C70 from 1.4 to 2.3%. The quasi-epitaxy model is proposed to explain the multilayer epitaxy.

  16. X-ray characterization of the microstructure in a CdTe epitaxial layer

    Energy Technology Data Exchange (ETDEWEB)

    Gao Dachao; Stevenson, A.W.; Wilkins, S.W. (CSIRO Div. of Materials Science and Tech., Clayton, Victoria (Australia)); Pain, G.N. (Telecon Australia Research Labs., Clayton, Victoria (Australia))

    1991-12-10

    High-resolution X-ray diffraction studies of a twinned (anti 1anti 1anti 1) CdTe epilayer on (0001) sapphire substrate were carried out. The structural properties and uniformity of the CdTe epilayer were established from analyses of Lang topographs, double-crystal rocking-curve maps and twin-content maps. Maps of the full width at half-maximum (FWHM) of the rocking curve were taken for two twin species (1 and 2), which relate to each other by a rotation of 180deg about the (anti 1anti 1anti 1) axis. The value of the FWHM varied over the sample from 108 to over 1000 arcs. The twin-content maps were determined over the whole layer, and showed significant variations. Lang topographs were taken using the asymmetric anti 4anti 2anti 2 Bragg reflection for both twins and the results were consistent with the rocking curves. The topographs showed that clusters of dislocations exist in the layer and many of them lie along the (anti 1anti 12) direction parallel to the (anti 1anti 1anti 1) CdTe layer surface with the Burgers vector in the (1anti 10) direction. Evidence of double-positioning twins was found in the CdTe epilayer. It is shown that combinations of rocking-curve maps and topographs give a much more informative characterization than a single-point measurement of the rocking curve. (orig.).

  17. Epitaxial growth of an antireflective, conductive, graded index ITO nanowire layer

    Directory of Open Access Journals (Sweden)

    Colm eO'Dwyer

    2013-10-01

    Full Text Available Nanoporous and nanostructured films, assemblies and arrangements are important from an applied point of view in microelectronics, photonics and optical materials. The ability to minimize reflection, control light output and use contrast and variation of the refractive index to modify photonic characteristics can provide routes to enhanced photonic crystal devices, omnidirectional reflectors, antireflection coatings and broadband absorbing materials. This work shows how multiscale branching of defect-free ITO NWs grown as a layer with a graded refractive index improves antireflection properties and shifts the transparency window into the near-infrared (NIR. The measurements confirm the structural quality and growth mechanism of the NW layer without any heterogeneous seeding for NW growth. Optical reflectance measurements confirm broadband antireflection down to <5% between 1.3-1.6 um which is tunable with the NW density. The work also outlines how the suppression of the Burstein-Moss shifts using refractive index variation allows transparency in a conductive NW layer into NIR range.

  18. Atomic layer deposition on nanoparticles in a rotary reactor

    Science.gov (United States)

    McCormick, Jarod Alan

    Challenges are encountered during atomic layer deposition (ALD) on large quantities of nanoparticles. The particles must be agitated or vigorously mixed to perform the ALD surface reactions in reasonable times and to prevent the particles from being agglomerated by the ALD film. The high surface area of nanoparticles also demands efficient reactant usage because large quantities of reactant are required for the surface reactions to reach completion. To address these challenges, a novel rotary reactor was developed to achieve constant particle agitation during static ALD reactant exposures. In the design of this new reactor, a cylindrical drum with porous metal walls was positioned inside a vacuum chamber. The porous cylindrical drum was rotated by a magnetically coupled rotary feedthrough. By rotating the cylindrical drum to obtain a centrifugal force of less than one gravitational force, the particles were agitated by a continuous "avalanche" of particles. The effectiveness of this rotary reactor was demonstrated by Al 2O3 ALD on ZrO2 particles. A number of techniques including transmission electron microscopy, Fourier transform infrared spectroscopy, scanning Auger spectroscopy and x-ray photoelectron spectroscopy confirmed that the Al2O3 ALD film conformally coats the ZrO 2 particles. Combining static reactant exposures with a very high surface area sample in the rotary reactor also provides unique opportunities for studying the surface chemistry during ALD. Sequential, subsaturating doses can be used to examine the self-limiting behavior of the ALD reactions in the rotary reactor. This dosing method is the first demonstration of self-limiting ALD on bulk quantities of nanoparticles. By combining these sequential, subsaturating doses with quadrupole mass spectrometry, ALD reactions can be analyzed from the gas phase using full mass spectrum analysis. The reaction products are present in a high enough concentration to discern a gas phase mechanism for reactions

  19. Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

    International Nuclear Information System (INIS)

    An ultrathin yttria-stabilized zirconia (YSZ) blocking layer deposited by atomic layer deposition (ALD) was utilized for improving the performance and reliability of low-temperature solid oxide fuel cells (SOFCs) supported by an anodic aluminum oxide substrate. Physical vapor-deposited YSZ and gadolinia-doped ceria (GDC) electrolyte layers were deposited by a sputtering method. The ultrathin ALD YSZ blocking layer was inserted between the YSZ and GDC sputtered layers. To investigate the effects of an inserted ultrathin ALD blocking layer, SOFCs with and without an ultrathin ALD blocking layer were electrochemically characterized. The open circuit voltage (1.14 V) of the ALD blocking-layered SOFC was visibly higher than that (1.05 V) of the other cell. Furthermore, the ALD blocking layer augmented the power density and improved the reproducibility

  20. Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate

    Energy Technology Data Exchange (ETDEWEB)

    Yu, Wonjong; Cho, Gu Young; Noh, Seungtak; Tanveer, Waqas Hassan; Cha, Suk Won, E-mail: swcha@snu.ac.kr [School of Mechanical and Aerospace Engineering, Seoul National University, San 56-1, Daehak dong, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Ji, Sanghoon [Graduate School of Convergence Science and Technology, Seoul National University, 864-1, Iui-dong, Yeongtong-gu, Suwon 443-270 (Korea, Republic of); An, Jihwan [Manufacturing Systems and Design Engineering Program, Seoul National University of Science and Technology, 232 Gongneung-ro, Nowon-gu, Seoul 139-743 (Korea, Republic of)

    2015-01-15

    An ultrathin yttria-stabilized zirconia (YSZ) blocking layer deposited by atomic layer deposition (ALD) was utilized for improving the performance and reliability of low-temperature solid oxide fuel cells (SOFCs) supported by an anodic aluminum oxide substrate. Physical vapor-deposited YSZ and gadolinia-doped ceria (GDC) electrolyte layers were deposited by a sputtering method. The ultrathin ALD YSZ blocking layer was inserted between the YSZ and GDC sputtered layers. To investigate the effects of an inserted ultrathin ALD blocking layer, SOFCs with and without an ultrathin ALD blocking layer were electrochemically characterized. The open circuit voltage (1.14 V) of the ALD blocking-layered SOFC was visibly higher than that (1.05 V) of the other cell. Furthermore, the ALD blocking layer augmented the power density and improved the reproducibility.

  1. Atomic-layer deposited thulium oxide as a passivation layer on germanium

    Energy Technology Data Exchange (ETDEWEB)

    Mitrovic, I. Z., E-mail: ivona@liverpool.ac.uk; Hall, S.; Weerakkody, A. D.; Sedghi, N. [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ (United Kingdom); Althobaiti, M.; Hesp, D.; Dhanak, V. R. [Department of Physics and Stephenson Institute for Renewable Energy, University of Liverpool, Liverpool L69 7ZF (United Kingdom); Santoni, A. [ENEA, Frascati Research Centre, via E. Fermi 45, 00044 Frascati (Italy); Chalker, P. R. [Department of Engineering, University of Liverpool, Brownlow Hill, Liverpool L69 3GH (United Kingdom); Henkel, C.; Dentoni Litta, E.; Hellström, P.-E.; Östling, M. [School of ICT, KTH Royal Institute of Technology, Isafjordsgatan 22, 164 40 Kista (Sweden); Tan, H.; Schamm-Chardon, S. [CEMES-CNRS and Université de Toulouse, nMat group, BP 94347, 31055 Toulouse Cedex 4 (France)

    2015-06-07

    A comprehensive study of atomic-layer deposited thulium oxide (Tm{sub 2}O{sub 3}) on germanium has been conducted using x-ray photoelectron spectroscopy (XPS), vacuum ultra-violet variable angle spectroscopic ellipsometry, high-resolution transmission electron microscopy (HRTEM), and electron energy-loss spectroscopy. The valence band offset is found to be 3.05 ± 0.2 eV for Tm{sub 2}O{sub 3}/p-Ge from the Tm 4d centroid and Ge 3p{sub 3/2} charge-corrected XPS core-level spectra taken at different sputtering times of a single bulk thulium oxide sample. A negligible downward band bending of ∼0.12 eV is observed during progressive differential charging of Tm 4d peaks. The optical band gap is estimated from the absorption edge and found to be 5.77 eV with an apparent Urbach tail signifying band gap tailing at ∼5.3 eV. The latter has been correlated to HRTEM and electron diffraction results corroborating the polycrystalline nature of the Tm{sub 2}O{sub 3} films. The Tm{sub 2}O{sub 3}/Ge interface is found to be rather atomically abrupt with sub-nanometer thickness. In addition, the band line-up of reference GeO{sub 2}/n-Ge stacks obtained by thermal oxidation has been discussed and derived. The observed low reactivity of thulium oxide on germanium as well as the high effective barriers for holes (∼3 eV) and electrons (∼2 eV) identify Tm{sub 2}O{sub 3} as a strong contender for interfacial layer engineering in future generations of scaled high-κ gate stacks on Ge.

  2. Characterization of GaN/AlGaN epitaxial layers grown by metalorganic chemical vapour deposition for high electron mobility transistor applications

    Indian Academy of Sciences (India)

    Bhubesh Chander Joshi; Manish Mathew; B C Joshi; D Kumar; C Dhanavantri

    2010-01-01

    GaN and AlGaN epitaxial layers are grown by a metalorganic chemical vapour deposition (MOCVD) system. The crystalline quality of these epitaxially grown layers is studied by different characterization techniques. PL measurements indicate band edge emission peak at 363.8 nm and 312 nm for GaN and AlGaN layers respectively. High resolution XRD (HRXRD) peaks show FWHM of 272 and 296 arcsec for the (0 0 0 2) plane of GaN and GaN in GaN/AlGaN respectively. For GaN buffer layer, the Hall mobility is 346 cm2/V-s and carrier concentration is 4.5 × 1016 /cm3. AFM studies on GaN buffer layer show a dislocation density of 2 × 108/cm2 by wet etching in hot phosphoric acid. The refractive indices of GaN buffer layer on sapphire at 633 nm are 2.3544 and 2.1515 for TE and TM modes respectively.

  3. Multidirectional channeling analysis of epitaxial CdTe layers using an automatic RBS/channeling system

    Energy Technology Data Exchange (ETDEWEB)

    Wielunski, L.S.; Kenny, M.J. [CSIRO, Lindfield, NSW (Australia). Applied Physics Div.

    1993-12-31

    Rutherford Backscattering Spectrometry (RBS) is an ion beam analysis technique used in many fields. The high depth and mass resolution of RBS make this technique very useful in semiconductor material analysis [1]. The use of ion channeling in combination with RBS creates a powerful technique which can provide information about crystal quality and structure in addition to mass and depth resolution [2]. The presence of crystal defects such as interstitial atoms, dislocations or dislocation loops can be detected and profiled [3,4]. Semiconductor materials such as CdTe, HgTe and Hg+xCd{sub 1-x}Te generate considerable interest due to applications as infrared detectors in many technological areas. The present paper demonstrates how automatic RBS and multidirectional channeling analysis can be used to evaluate crystal quality and near surface defects. 6 refs., 1 fig.

  4. Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers

    Science.gov (United States)

    2016-01-01

    We present an optimized approach for the deposition of Al2O3 (as a model secondary material) coating into high aspect ratio (≈180) anodic TiO2 nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al2O3 precursors on the resulting coating thickness, ALD processes with different exposure times (i.e., 0.5, 2, 5, and 10 s) of the trimethylaluminum (TMA) precursor were performed. Uniform coating of the nanotube interiors was achieved with longer exposure times (5 and 10 s), as verified by detailed scanning electron microscopy analysis. Quartz crystal microbalance measurements were used to monitor the deposition process and its particular features due to the tube diameter gradient. Finally, theoretical calculations were performed to calculate the minimum precursor exposure time to attain uniform coating. Theoretical values on the diffusion regime matched with the experimental results and helped to obtain valuable information for further optimization of ALD coating processes. The presented approach provides a straightforward solution toward the development of many novel devices, based on a high surface area interface between TiO2 nanotubes and a secondary material (such as Al2O3). PMID:27643411

  5. Epitaxial growth of antiphase boundary free GaAs layer on 300 mm Si(001) substrate by metalorganic chemical vapour deposition with high mobility

    Science.gov (United States)

    Alcotte, R.; Martin, M.; Moeyaert, J.; Cipro, R.; David, S.; Bassani, F.; Ducroquet, F.; Bogumilowicz, Y.; Sanchez, E.; Ye, Z.; Bao, X. Y.; Pin, J. B.; Baron, T.

    2016-04-01

    Metal organic chemical vapor deposition of GaAs on standard nominal 300 mm Si(001) wafers was studied. Antiphase boundary (APB) free epitaxial GaAs films as thin as 150 nm were obtained. The APB-free films exhibit an improvement of the room temperature photoluminescence signal with an increase of the intensity of almost a factor 2.5. Hall effect measurements show an electron mobility enhancement from 200 to 2000 cm2/V s. The GaAs layers directly grown on industrial platform with no APBs are perfect candidates for being integrated as active layers for nanoelectronic as well as optoelectronic devices in a CMOS environment.

  6. Strain relaxation during solid-phase epitaxial crystallisation of Ge{sub x}Si{sub 1-x} alloy layers with depth dependent G{sub e} compositions

    Energy Technology Data Exchange (ETDEWEB)

    Wong, Wahchung; Elliman, R.G.; Kringhoj, P. [Australian National Univ., Canberra, ACT (Australia). Research School of Physical Sciences

    1993-12-31

    The solid-phase epitaxial crystallisation of depth dependent Ge{sub x}Si{sub lx} alloy layers produced by implanting Ge into Si substrates was studied. In-situ monitoring was done using time-resolved reflectivity (TRR) whilst post-anneal defect structures were characterised by Rutherford backscattering and channeling spectrometry (RBS-C) and transmission electron microscopy (TEM). Particular attention was directed at Ge concentrations above the critical concentration for the growth of fully strained layers. Strain relief is shown to be correlated with a sudden reduction in crystallisation velocity caused by roughening of the crystalline/amorphous interface. 11 refs., 1 tab., 2 figs.

  7. Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers.

    Science.gov (United States)

    Andringa, Anne-Marije; Perrotta, Alberto; de Peuter, Koen; Knoops, Harm C M; Kessels, Wilhelmus M M; Creatore, Mariadriana

    2015-10-14

    Encapsulation of organic (opto-)electronic devices, such as organic light-emitting diodes (OLEDs), photovoltaic cells, and field-effect transistors, is required to minimize device degradation induced by moisture and oxygen ingress. SiNx moisture permeation barriers have been fabricated using a very recently developed low-temperature plasma-assisted atomic layer deposition (ALD) approach, consisting of half-reactions of the substrate with the precursor SiH2(NH(t)Bu)2 and with N2-fed plasma. The deposited films have been characterized in terms of their refractive index and chemical composition by spectroscopic ellipsometry (SE), X-ray photoelectron spectroscopy (XPS), and Fourier-transform infrared spectroscopy (FTIR). The SiNx thin-film refractive index ranges from 1.80 to 1.90 for films deposited at 80 °C up to 200 °C, respectively, and the C, O, and H impurity levels decrease when the deposition temperature increases. The relative open porosity content of the layers has been studied by means of multisolvent ellipsometric porosimetry (EP), adopting three solvents with different kinetic diameters: water (∼0.3 nm), ethanol (∼0.4 nm), and toluene (∼0.6 nm). Irrespective of the deposition temperature, and hence the impurity content in the SiNx films, no uptake of any adsorptive has been observed, pointing to the absence of open pores larger than 0.3 nm in diameter. Instead, multilayer development has been observed, leading to type II isotherms that, according to the IUPAC classification, are characteristic of nonporous layers. The calcium test has been performed in a climate chamber at 20 °C and 50% relative humidity to determine the intrinsic water vapor transmission rate (WVTR) of SiNx barriers deposited at 120 °C. Intrinsic WVTR values in the range of 10(-6) g/m2/day indicate excellent barrier properties for ALD SiNx layers as thin as 10 nm, competing with that of state-of-the-art plasma-enhanced chemical vapor-deposited SiNx layers of a few hundred

  8. GaN Growth with Low-Temperature GaN Buffer Layers Directly on Si(111) by Hydride Vapour Phase Epitaxy

    Institute of Scientific and Technical Information of China (English)

    俞慧强; 陈琳; 张荣; 修向前; 谢自力; 叶宇达; 顾书林; 沈波; 施毅; 郑有蚪

    2004-01-01

    GaN films are grown on Si(111) with low-temperature GaN (LT-GaN) layers as buffer layers by hydride vapour phase epitaxy (HVPE). The deposition temperature of the LT-GaN layers is changed from 400 to 900 ℃. When the LT-GaN layer is deposited at 600 ℃, GaN films show only c-oriented GaN (0002) and have the band edge emission at 365 nm with no yellow luminescence bands. The results indicate that the LT-GaN layer can effectively block the unexpected Si etching by reactive gas during the GaN growth. However, the surface roughness of these GaN films grown on Si(111) is larger than that of GaN films on c-plane sapphire.

  9. Electrical properties of amorphous and epitaxial Si-rich silicide films composed of W-atom-encapsulated Si clusters

    Energy Technology Data Exchange (ETDEWEB)

    Okada, Naoya, E-mail: okada-naoya@aist.go.jp [Japan Science and Technology Agency, PRESTO, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012 (Japan); Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 (Japan); Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573 (Japan); Uchida, Noriyuki [Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 (Japan); Kanayama, Toshihiko [Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573 (Japan); National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)

    2015-03-07

    We investigated the electrical properties and derived the energy band structures of amorphous Si-rich W silicide (a-WSi{sub n}) films and approximately 1-nm-thick crystalline WSi{sub n} epitaxial films (e-WSi{sub n}) on Si (100) substrates with composition n = 8–10, both composed of Si{sub n} clusters each of which encapsulates a W atom (WSi{sub n} clusters). The effect of annealing in the temperature range of 300–500 °C was also investigated. The Hall measurements at room temperature revealed that a-WSi{sub n} is a nearly intrinsic semiconductor, whereas e-WSi{sub n} is an n-type semiconductor with electron mobility of ∼8 cm{sup 2}/V s and high sheet electron density of ∼7 × 10{sup 12 }cm{sup −2}. According to the temperature dependence of the electrical properties, a-WSi{sub n} has a mobility gap of ∼0.1 eV and mid gap states in the region of 10{sup 19 }cm{sup −3} eV{sup −1} in an optical gap of ∼0.6 eV with considerable band tail states; e-WSi{sub n} has a donor level of ∼0.1 eV with sheet density in the region of 10{sup 12 }cm{sup −2} in a band gap of ∼0.3 eV. These semiconducting band structures are primarily attributed to the open band-gap properties of the constituting WSi{sub n} cluster. In a-WSi{sub n}, the random network of the clusters generates the band tail states, and the formation of Si dangling bonds results in the generation of mid gap states; in e-WSi{sub n}, the original cluster structure is highly distorted to accommodate the Si lattice, resulting in the formation of intrinsic defects responsible for the donor level.

  10. Integration of atomic layer deposited high-k dielectrics on GaSb via hydrogen plasma exposure

    Science.gov (United States)

    Ruppalt, Laura B.; Cleveland, Erin R.; Champlain, James G.; Bennett, Brian R.; Prokes, Sharka M.

    2014-12-01

    In this letter we report the efficacy of a hydrogen plasma pretreatment for integrating atomic layer deposited (ALD) high-k dielectric stacks with device-quality p-type GaSb(001) epitaxial layers. Molecular beam eptiaxy-grown GaSb surfaces were subjected to a 30 minute H2/Ar plasma treatment and subsequently removed to air. High-k HfO2 and Al2O3/HfO2 bilayer insulating films were then deposited via ALD and samples were processed into standard metal-oxide-semiconductor (MOS) capacitors. The quality of the semiconductor/dielectric interface was probed by current-voltage and variable-frequency admittance measurements. Measurement results indicate that the H2-plamsa pretreatment leads to a low density of interface states nearly independent of the deposited dielectric material, suggesting that pre-deposition H2-plasma exposure, coupled with ALD of high-k dielectrics, may provide an effective means for achieving high-quality GaSb MOS structures for advanced Sb-based digital and analog electronics.

  11. Integration of atomic layer deposited high-k dielectrics on GaSb via hydrogen plasma exposure

    Directory of Open Access Journals (Sweden)

    Laura B. Ruppalt

    2014-12-01

    Full Text Available In this letter we report the efficacy of a hydrogen plasma pretreatment for integrating atomic layer deposited (ALD high-k dielectric stacks with device-quality p-type GaSb(001 epitaxial layers. Molecular beam eptiaxy-grown GaSb surfaces were subjected to a 30 minute H2/Ar plasma treatment and subsequently removed to air. High-k HfO2 and Al2O3/HfO2 bilayer insulating films were then deposited via ALD and samples were processed into standard metal-oxide-semiconductor (MOS capacitors. The quality of the semiconductor/dielectric interface was probed by current-voltage and variable-frequency admittance measurements. Measurement results indicate that the H2-plamsa pretreatment leads to a low density of interface states nearly independent of the deposited dielectric material, suggesting that pre-deposition H2-plasma exposure, coupled with ALD of high-k dielectrics, may provide an effective means for achieving high-quality GaSb MOS structures for advanced Sb-based digital and analog electronics.

  12. Vertically Oriented Growth of GaN Nanorods on Si Using Graphene as an Atomically Thin Buffer Layer.

    Science.gov (United States)

    Heilmann, Martin; Munshi, A Mazid; Sarau, George; Göbelt, Manuela; Tessarek, Christian; Fauske, Vidar T; van Helvoort, Antonius T J; Yang, Jianfeng; Latzel, Michael; Hoffmann, Björn; Conibeer, Gavin; Weman, Helge; Christiansen, Silke

    2016-06-01

    The monolithic integration of wurtzite GaN on Si via metal-organic vapor phase epitaxy is strongly hampered by lattice and thermal mismatch as well as meltback etching. This study presents single-layer graphene as an atomically thin buffer layer for c-axis-oriented growth of vertically aligned GaN nanorods mediated by nanometer-sized AlGaN nucleation islands. Nanostructures of similar morphology are demonstrated on graphene-covered Si(111) as well as Si(100). High crystal and optical quality of the nanorods are evidenced through scanning transmission electron microscopy, micro-Raman, and cathodoluminescence measurements supported by finite-difference time-domain simulations. Current-voltage characteristics revealed high vertical conduction of the as-grown GaN nanorods through the Si substrates. These findings are substantial to advance the integration of GaN-based devices on any substrates of choice that sustains the GaN growth temperatures, thereby permitting novel designs of GaN-based heterojunction device concepts.

  13. Vertically Oriented Growth of GaN Nanorods on Si Using Graphene as an Atomically Thin Buffer Layer.

    Science.gov (United States)

    Heilmann, Martin; Munshi, A Mazid; Sarau, George; Göbelt, Manuela; Tessarek, Christian; Fauske, Vidar T; van Helvoort, Antonius T J; Yang, Jianfeng; Latzel, Michael; Hoffmann, Björn; Conibeer, Gavin; Weman, Helge; Christiansen, Silke

    2016-06-01

    The monolithic integration of wurtzite GaN on Si via metal-organic vapor phase epitaxy is strongly hampered by lattice and thermal mismatch as well as meltback etching. This study presents single-layer graphene as an atomically thin buffer layer for c-axis-oriented growth of vertically aligned GaN nanorods mediated by nanometer-sized AlGaN nucleation islands. Nanostructures of similar morphology are demonstrated on graphene-covered Si(111) as well as Si(100). High crystal and optical quality of the nanorods are evidenced through scanning transmission electron microscopy, micro-Raman, and cathodoluminescence measurements supported by finite-difference time-domain simulations. Current-voltage characteristics revealed high vertical conduction of the as-grown GaN nanorods through the Si substrates. These findings are substantial to advance the integration of GaN-based devices on any substrates of choice that sustains the GaN growth temperatures, thereby permitting novel designs of GaN-based heterojunction device concepts. PMID:27124605

  14. Two-Dimensional Electron Gas at SrTiO3-Based Oxide Heterostructures via Atomic Layer Deposition

    Directory of Open Access Journals (Sweden)

    Sang Woon Lee

    2016-01-01

    Full Text Available Two-dimensional electron gas (2DEG at an oxide interface has been attracting considerable attention for physics research and nanoelectronic applications. Early studies reported the formation of 2DEG at semiconductor interfaces (e.g., AlGaAs/GaAs heterostructures with interesting electrical properties such as high electron mobility. Besides 2DEG formation at semiconductor junctions, 2DEG was realized at the interface of an oxide heterostructure such as the LaAlO3/SrTiO3 (LAO/STO heterojunction. The origin of 2DEG was attributed to the well-known “polar catastrophe” mechanism in oxide heterostructures, which consist of an epitaxial LAO layer on a single crystalline STO substrate among proposed mechanisms. Recently, it was reported that the creation of 2DEG was achieved using the atomic layer deposition (ALD technique, which opens new functionality of ALD in emerging nanoelectronics. This review is focused on the origin of 2DEG at oxide heterostructures using the ALD process. In particular, it addresses the origin of 2DEG at oxide interfaces based on an alternative mechanism (i.e., oxygen vacancies.

  15. Characterization and modeling of atomic layer deposited high-density trench capacitors in silicon

    NARCIS (Netherlands)

    Matters-Kammerer, M.K.; Jinesh, K.B.; Rijks, T.G.S.M.; Roozeboom, F.; Klootwijk, J.H.

    2012-01-01

    A detailed electrical analysis of multiple layer trench capacitors fabricated in silicon with atomic-layer-deposited Al 2O 3 and TiN is presented. It is shown that in situ ozone annealing of the Al 2O 3 layers prior to the TiN electrode deposition significantly improves the electric properties of th

  16. Reducing interface recombination for Cu(In,Ga)Se{sub 2} by atomic layer deposited buffer layers

    Energy Technology Data Exchange (ETDEWEB)

    Hultqvist, Adam; Bent, Stacey F. [Department of Chemical Engineering, Stanford University, Stanford, California 94305 (United States); Li, Jian V.; Kuciauskas, Darius; Dippo, Patricia; Contreras, Miguel A.; Levi, Dean H. [National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

    2015-07-20

    Partial CuInGaSe{sub 2} (CIGS) solar cell stacks with different atomic layer deposited buffer layers and pretreatments were analyzed by photoluminescence (PL) and capacitance voltage (CV) measurements to investigate the buffer layer/CIGS interface. Atomic layer deposited ZnS, ZnO, and SnO{sub x} buffer layers were compared with chemical bath deposited CdS buffer layers. Band bending, charge density, and interface state density were extracted from the CV measurement using an analysis technique new to CIGS. The surface recombination velocity calculated from the density of interface traps for a ZnS/CIGS stack shows a remarkably low value of 810 cm/s, approaching the range of single crystalline II–VI systems. Both the PL spectra and its lifetime depend on the buffer layer; thus, these measurements are not only sensitive to the absorber but also to the absorber/buffer layer system. Pretreatment of the CIGS prior to the buffer layer deposition plays a significant role on the electrical properties for the same buffer layer/CIGS stack, further illuminating the importance of good interface formation. Finally, ZnS is found to be the best performing buffer layer in this study, especially if the CIGS surface is pretreated with potassium cyanide.

  17. High-barrier Schottky contact on n-type 4H-SiC epitaxial layer and studies of defect levels by deep level transient spectroscopy (DLTS)

    Science.gov (United States)

    Nguyen, Khai V.; Pak, Rahmi O.; Oner, Cihan; Mannan, Mohammad A.; Mandal, Krishna C.

    2015-08-01

    High barrier Schottky contact has been fabricated on 50 μm n-type 4H-SiC epitaxial layers grown on 350 μm thick substrate 8° off-cut towards the [11̅20] direction. The 4H-SiC epitaxial wafer was diced into 10 x 10 mm2 samples. The metal-semiconductor junctions were fabricated by photolithography and dc sputtering with ruthenium (Ru). The junction properties were characterized through current-voltage (I-V) and capacitance-voltage (C-V) measurements. Detectors were characterized by alpha spectroscopy measurements in terms of energy resolution and charge collection efficiency using a 0.1 μCi 241Am radiation source. It was found that detectors fabricated from high work function rare transition metal Ru demonstrated very low leakage current and significant improvement of detector performance. Defect characterization of the epitaxial layers was conducted by deep level transient spectroscopy (DLTS) to thoroughly investigate the defect levels in the active region. The presence of a new defect level induced by this rare transition metal-semiconductor interface has been identified and characterized.

  18. Control of metamorphic buffer structure and device performance of InxGa1−xAs epitaxial layers fabricated by metal organic chemical vapor deposition

    International Nuclear Information System (INIS)

    Using a step-graded (SG) buffer structure via metal-organic chemical vapor deposition, we demonstrate a high suitability of In0.5Ga0.5As epitaxial layers on a GaAs substrate for electronic device application. Taking advantage of the technique’s precise control, we were able to increase the number of SG layers to achieve a fairly low dislocation density (∼106 cm−2), while keeping each individual SG layer slightly exceeding the critical thickness (∼80 nm) for strain relaxation. This met the demanded but contradictory requirements, and even offered excellent scalability by lowering the whole buffer structure down to 2.3 μm. This scalability overwhelmingly excels the forefront studies. The effects of the SG misfit strain on the crystal quality and surface morphology of In0.5Ga0.5As epitaxial layers were carefully investigated, and were correlated to threading dislocation (TD) blocking mechanisms. From microstructural analyses, TDs can be blocked effectively through self-annihilation reactions, or hindered randomly by misfit dislocation mechanisms. Growth conditions for avoiding phase separation were also explored and identified. The buffer-improved, high-quality In0.5Ga0.5As epitaxial layers enabled a high-performance, metal-oxide-semiconductor capacitor on a GaAs substrate. The devices displayed remarkable capacitance–voltage responses with small frequency dispersion. A promising interface trap density of 3 × 1012 eV−1 cm−2 in a conductance test was also obtained. These electrical performances are competitive to those using lattice-coherent but pricey InGaAs/InP systems. (paper)

  19. Atom Nano-lithography with Multi-layer Light Masks: Particle Optics Analysis

    CERN Document Server

    Arun, R; Pfau, T

    2005-01-01

    We study the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the focusing setup is analyzed both in the paraxial approximation and in the regime of nonlinear spatial squeezing for the thin-thin as well as thin-thick atom lens combinations. It is shown that the optimized double light mask may considerably reduce the imaging problems, improve the quality of focusing and enhance the contrast ratio of the deposited structures.

  20. Visualization of arrangements of carbon atoms in graphene layers by Raman mapping and atomic-resolution TEM

    KAUST Repository

    Cong, Chunxiao

    2013-02-01

    In-plane and out-of-plane arrangements of carbon atoms in graphene layers play critical roles in the fundamental physics and practical applications of these novel two-dimensional materials. Here, we report initial results on the edge/crystal orientations and stacking orders of bi-and tri-layer graphene (BLG and TLG) from Raman spectroscopy and transmission electron microscopy (TEM) experiments performed on the same sample. We introduce a new method of transferring graphene flakes onto a normal TEM grid. Using this novel method, we probed the BLG and TLG flakes that had been previously investigated by Raman scattering with high-resolution (atomic) TEM.

  1. Layer-by-layer epitaxial growth of a Bi sub 2 Sr sub 2 CuO sub 6 thin film on a Bi sub 2 Sr sub 2 CaCu sub 2 O sub 8 single crystal

    Energy Technology Data Exchange (ETDEWEB)

    Matsumoto, T.; Kawai, T.; Kitahama, K.; Kawai, S. (The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka, Ibaraki, Osaka 567, Japan (JP)); Shigaki, I.; Kawate, Y. (Superconducting Cryogenic Technology Center, Kobe Steel, Ltd., Takatsukadai 1-chome, Nishi-ku, Kobe 651-22, (Japan))

    1991-05-06

    The epitaxial growth of a Bi{sub 2}Sr{sub 2}CuO{sub 6} (2201) thin film on a Bi{sub 2}Sr{sub 2}CaCu{sub 2}O{sub 8} (2212) single crystal has been performed using computer-controlled laser molecular beam epitaxy. The surface of the 2212 single crystal used as the substrate is smooth and invariant under the growth condition at 640 {degree}C in NO{sub 2} pressure of 1{times}10{sup {minus}5} mbar. The growth process of the 2201 film has been observed by {ital in} {ital situ} reflection high-energy electron diffraction (RHEED), and the layer-by-layer growth of the 2201 phase is confirmed by the oscillation of RHEED intensities. During the growth, a modulated surface structure which is characteristic of the Bi cuprate crystals is always present.

  2. Perspective: Oxide molecular-beam epitaxy rocks!

    Directory of Open Access Journals (Sweden)

    Darrell G. Schlom

    2015-06-01

    Full Text Available Molecular-beam epitaxy (MBE is the “gold standard” synthesis technique for preparing semiconductor heterostructures with high purity, high mobility, and exquisite control of layer thickness at the atomic-layer level. Its use for the growth of multicomponent oxides got off to a rocky start 30 yr ago, but in the ensuing decades, it has become the definitive method for the preparation of oxide heterostructures too, particularly when it is desired to explore their intrinsic properties. Examples illustrating the unparalleled achievements of oxide MBE are given; these motivate its expanding use for exploring the potentially revolutionary states of matter possessed by oxide systems.

  3. Perspective: Oxide molecular-beam epitaxy rocks!

    Energy Technology Data Exchange (ETDEWEB)

    Schlom, Darrell G., E-mail: schlom@cornell.edu [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA and Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853 (United States)

    2015-06-01

    Molecular-beam epitaxy (MBE) is the “gold standard” synthesis technique for preparing semiconductor heterostructures with high purity, high mobility, and exquisite control of layer thickness at the atomic-layer level. Its use for the growth of multicomponent oxides got off to a rocky start 30 yr ago, but in the ensuing decades, it has become the definitive method for the preparation of oxide heterostructures too, particularly when it is desired to explore their intrinsic properties. Examples illustrating the unparalleled achievements of oxide MBE are given; these motivate its expanding use for exploring the potentially revolutionary states of matter possessed by oxide systems.

  4. Impact of growth and annealing conditions on the parameters of Ge/Si(001) relaxed layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Yurasov, D. V., E-mail: Inquisitor@ipm.sci-nnov.ru [Russian Academy of Sciences, Institute for Physics of Microstructures (Russian Federation); Bobrov, A. I. [Lobachevsky State University of Nizhny Novgorod (Russian Federation); Daniltsev, V. M.; Novikov, A. V. [Russian Academy of Sciences, Institute for Physics of Microstructures (Russian Federation); Pavlov, D. A. [Lobachevsky State University of Nizhny Novgorod (Russian Federation); Skorokhodov, E. V.; Shaleev, M. V.; Yunin, P. A. [Russian Academy of Sciences, Institute for Physics of Microstructures (Russian Federation)

    2015-11-15

    Influence of the Ge layer thickness and annealing conditions on the parameters of relaxed Ge/Si(001) layers grown by molecular beam epitaxy via two-stage growth is investigated. The dependences of the threading dislocation density and surface roughness on the Ge layer thickness, annealing temperature and time, and the presence of a hydrogen atmosphere are obtained. As a result of optimization of the growth and annealing conditions, relaxed Ge/Si(001) layers which are thinner than 1 μm with a low threading dislocation density on the order of 10{sup 7} cm{sup –2} and a root mean square roughness of less than 1 nm are obtained.

  5. Improvement on the breakdown voltage for silicon-on-insulator devices based on epitaxy-separation by implantation oxygen by a partial buried n+-layer

    Institute of Scientific and Technical Information of China (English)

    Hu Sheng-Dong; Wu Li-Juan; Zhou Jian-Lin; Gan Ping; Zhang Bo; Li Zhao-Ji

    2012-01-01

    A novel silicon-on-insulator (SOI) high-voltage device based on epitaxy-separation by implantation oxygen (SIMOX) with a partial buried n+-layer silicon-on-insulator (PBN SOI) is proposed in this paper. Based on the proposed expressions of the vertical interface electric field,the high concentration interface charges which are accumulated on the interface between top silicon layer and buried oxide layer (BOX) effectively enhance the electric field of the BOX (EI),resulting in a high breakdown voltage (BV) for the device.For the same thicknesses of top silicon layer (10 μ-n) and BOX (0.375 μm),the EI and BV of PBN SOI are improved by 186.5% and 45.4% in comparison with those of the conventional SOI,respectively.

  6. Comparison of the formation process and properties of epitaxial graphenes on Si-and C-face 6H-SiC substrates

    Institute of Scientific and Technical Information of China (English)

    Wang Dang-Chao; Zhang Yu-Ming; Zhang Yi-Men; Lei Tian-Min; Guo Hui; Wang Yue-Hu; Tang Xiao-Yan; Wang Hang

    2012-01-01

    In this paper,the epitaxial graphene layers grown on Si- and C-face 6H-SiC substrates are investigated under a low pressure of 400 Pa at 1600 ℃.By using atomic force microscopy and Raman spectroscopy,we find that there are distinct differences in the formation and the properties between the epitaxial graphene layers grown on the Si-face and the C-face substrates,including the hydrogen etching process,the stacking type,and the number of layers.Hopefully,our results will be useful for improving the quality of the epitaxial graphene on SiC substrate.

  7. Two-dimensional superconductivity in the cuprates revealed by atomic-layer-by-layer molecular beam epitaxy

    Science.gov (United States)

    Bollinger, A. T.; Božović, I.

    2016-10-01

    Various electronic phases displayed by cuprates that exhibit high temperature superconductivity continue to attract much interest. We provide a short review of several experiments that we have performed aimed at investigating the superconducting state in these compounds. Measurements on single-phase films, bilayers, and superlattices all point to the conclusion that the high-temperature superconductivity (HTS) in these materials is an essentially quasi-two dimensional phenomenon. With proper control over the film growth, HTS can exist in a single copper oxide plane with the critical temperatures as high as that achieved in the bulk samples.

  8. Atomic Layer Deposition on Carbon Nanotubes and their Assemblies

    Science.gov (United States)

    Stano, Kelly Lynn

    Global issues related to energy and the environment have motivated development of advanced material solutions outside of traditional metals ceramics, and polymers. Taking inspiration from composites, where the combination of two or more materials often yields superior properties, the field of organic-inorganic hybrids has recently emerged. Carbon nanotube (CNT)-inorganic hybrids have drawn widespread and increasing interest in recent years due to their multifunctionality and potential impact across several technologically important application areas. Before the impacts of CNT-inorganic hybrids can be realized however, processing techniques must be developed for their scalable production. Optimization in chemical vapor deposition (CVD) methods for synthesis of CNTs and vertically aligned CNT arrays has created production routes both high throughput and economically feasible. Additionally, control of CVD parameters has allowed for growth of CNT arrays that are able to be drawn into aligned sheets and further processed to form a variety of aligned 1, 2, and 3-dimensional bulk assemblies including ribbons, yarns, and foams. To date, there have only been a few studies on utilizing these bulk assemblies for the production of CNT-inorganic hybrids. Wet chemical methods traditionally used for fabricating CNT-inorganic hybrids are largely incompatible with CNT assemblies, since wetting and drying the delicate structures with solvents can destroy their structure. It is therefore necessary to investigate alternative processing strategies in order to advance the field of CNT-inorganic hybrids. In this dissertation, atomic layer deposition (ALD) is evaluated as a synthetic route for the production of large-scale CNT-metal oxide hybrids as well as pure metal oxide architectures utilizing CNT arrays, ribbons, and ultralow density foams as deposition templates. Nucleation and growth behavior of alumina was evaluated as a function of CNT surface chemistry. While highly graphitic

  9. Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Wenyu; Engstrom, James R., E-mail: jre7@cornell.edu [School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York 14853 (United States)

    2016-01-15

    The authors have examined the effect of two molecules that form self-assembled monolayers (SAMs) on the subsequent growth of TaN{sub x} by atomic layer deposition (ALD) on two substrate surfaces, SiO{sub 2} and Cu. The SAMs that the authors have investigated include two vapor phase deposited, fluorinated alkyl silanes: Cl{sub 3}Si(CH{sub 2}){sub 2}(CF{sub 2}){sub 5}CF{sub 3} (FOTS) and (C{sub 2}H{sub 5}O){sub 3}Si(CH{sub 2}){sub 2}(CF{sub 2}){sub 7}CF{sub 3} (HDFTEOS). Both the SAMs themselves and the TaN{sub x} thin films, grown using Ta[N(CH{sub 3}){sub 2}]{sub 5} and NH{sub 3}, were analyzed ex situ using contact angle, spectroscopic ellipsometry, x-ray photoelectron spectroscopy (XPS), and low energy ion-scattering spectroscopy (LEISS). First, the authors find that both SAMs on SiO{sub 2} are nominally stable at T{sub s} ∼ 300 °C, the substrate temperature used for ALD, while on Cu, the authors find that HDFTEOS thermally desorbs, while FOTS is retained on the surface. The latter result reflects the difference in the head groups of these two molecules. The authors find that both SAMs strongly attenuate the ALD growth of TaN{sub x} on SiO{sub 2}, by about a factor of 10, while on Cu, the SAMs have no effect on ALD growth. Results from LEISS and XPS are decisive in determining the nature of the mechanism of growth of TaN{sub x} on all surfaces. Growth on SiO{sub 2} is 2D and approximately layer-by-layer, while on the surfaces terminated by the SAMs, it nucleates at defect sites, is islanded, and is 3D. In the latter case, our results support growth of the TaN{sub x} thin film over the SAM, with a considerable delay in formation of a continuous thin film. Growth on Cu, with or without the SAMs, is also 3D and islanded, and there is also a delay in the formation of a continuous thin film as compared to growth on SiO{sub 2}. These results highlight the power of coupling measurements from both LEISS and XPS in examinations of ultrathin films formed by ALD.

  10. Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

    OpenAIRE

    Dey, Gangotri; Elliott, Simon D.

    2014-01-01

    We have used density functional theory (DFT) to study the mechanism of three step atomic layer deposition (ALD) of copper via formate and hydrazine. The technique holds promise for deposition of other transition metals.

  11. Elemental intermixing within an ultrathin SrRuO{sub 3} electrode layer in epitaxial heterostructure BaTiO{sub 3}/SrRuO{sub 3}/SrTiO{sub 3}

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, H. B.; Qi, R. J.; Ding, N. F.; Sun, L. [Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai, 200062 (China); Huang, R., E-mail: rhuang@ee.ecnu.edu.cn [Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai, 200062 (China); Nanostructures Research Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587 (Japan); Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, Shanxi 030006 (China); Duan, C. G., E-mail: cgduan@clpm.ecnu.edu.cn; Chu, J. H. [Key Laboratory of Polar Materials and Devices, Ministry of Education, East China Normal University, Shanghai, 200062 (China); Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, Shanxi 030006 (China); Fisher, Craig A. J. [Nanostructures Research Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587 (Japan); Ikuhara, Y. [Nanostructures Research Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587 (Japan); Institute of Engineering Innovation, The University of Tokyo, Tokyo 113-8656 (Japan)

    2016-01-15

    Aberration corrected scanning transmission electron microscopy is used to directly observe atom columns in an epitaxial BaTiO{sub 3} thin film deposited on a 3.6 nm-thick SrRuO{sub 3} electrode layer above an SrTiO{sub 3} (001) substrate. Compositional gradients across the heterointerfaces were examined using electron energy-loss spectroscopy techniques. It was found that a small amount of Ba and Ti had diffused into the SrRuO{sub 3} layer, and that this layer contained a non-negligible concentration of oxygen vacancies. Such point defects are expected to degrade the electrode’s electronic conductivity drastically, resulting in a much longer screening length. This may explain the discrepancy between experimental measurements and theoretical estimates of the ferroelectric critical thickness of a BaTiO{sub 3} ferroelectric barrier sandwiched between metallic SrRuO{sub 3} electrodes, since theoretical calculations generally assume ideal (stoichiometric) perovskite SrRuO{sub 3}.

  12. Elemental intermixing within an ultrathin SrRuO3 electrode layer in epitaxial heterostructure BaTiO3/SrRuO3/SrTiO3

    Directory of Open Access Journals (Sweden)

    H. B. Zhang

    2016-01-01

    Full Text Available Aberration corrected scanning transmission electron microscopy is used to directly observe atom columns in an epitaxial BaTiO3 thin film deposited on a 3.6 nm-thick SrRuO3 electrode layer above an SrTiO3 (001 substrate. Compositional gradients across the heterointerfaces were examined using electron energy-loss spectroscopy techniques. It was found that a small amount of Ba and Ti had diffused into the SrRuO3 layer, and that this layer contained a non-negligible concentration of oxygen vacancies. Such point defects are expected to degrade the electrode’s electronic conductivity drastically, resulting in a much longer screening length. This may explain the discrepancy between experimental measurements and theoretical estimates of the ferroelectric critical thickness of a BaTiO3 ferroelectric barrier sandwiched between metallic SrRuO3 electrodes, since theoretical calculations generally assume ideal (stoichiometric perovskite SrRuO3.

  13. Elemental intermixing within an ultrathin SrRuO3 electrode layer in epitaxial heterostructure BaTiO3/SrRuO3/SrTiO3

    International Nuclear Information System (INIS)

    Aberration corrected scanning transmission electron microscopy is used to directly observe atom columns in an epitaxial BaTiO3 thin film deposited on a 3.6 nm-thick SrRuO3 electrode layer above an SrTiO3 (001) substrate. Compositional gradients across the heterointerfaces were examined using electron energy-loss spectroscopy techniques. It was found that a small amount of Ba and Ti had diffused into the SrRuO3 layer, and that this layer contained a non-negligible concentration of oxygen vacancies. Such point defects are expected to degrade the electrode’s electronic conductivity drastically, resulting in a much longer screening length. This may explain the discrepancy between experimental measurements and theoretical estimates of the ferroelectric critical thickness of a BaTiO3 ferroelectric barrier sandwiched between metallic SrRuO3 electrodes, since theoretical calculations generally assume ideal (stoichiometric) perovskite SrRuO3

  14. Pulsed laser deposition of epitaxial Al-doped ZnO film on sapphire with GaN buffer layer

    International Nuclear Information System (INIS)

    Al-doped ZnO (ZnO:Al) films with thickness in the range of 0.5-0.9 μm were grown epitaxially on epi-GaN/sapphire (0001) by pulsed laser deposition (PLD; XeCl, λ=308 nm). The growth parameters such as substrate temperature, oxygen pressure and pulse repetition rate were established in a sequential manner to obtain highly epitaxial ZnO:Al film. The best films were obtained at substrate temperature of 400 deg. C, oxygen pressure of 1 mTorr and pulse repetition rate of 5 Hz. Reflection high-energy electron diffraction (RHEED) and low temperature photoluminescence (PL) studies confirm the high quality epitaxial nature of the film with near match and stacking order between ZnO and GaN

  15. Buffer-layer enhanced crystal growth of BaB{sub 6} (1 0 0) thin films on MgO (1 0 0) substrates by laser molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Kato, Yushi; Yamauchi, Ryosuke; Arai, Hideki; Tan, Geng [Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J2-46, Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan); Tsuchimine, Nobuo; Kobayashi, Susumu [Toshima Manufacturing Company Limited, 1414 Shimonomoto, Higashimatsuyama-shi, Saitama 355-0036 (Japan); Saeki, Kazuhiko; Takezawa, Nobutaka [Department of Materials Technology, Industrial Technology Center of Tochigi Prefecture, 367-1 Karinuma, Utsunomiya-shi, Tochigi 321-3224 (Japan); Mitsuhashi, Masahiko; Kaneko, Satoru [Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435 (Japan); Yoshimoto, Mamoru, E-mail: yoshimoto.m.aa@m.titech.ac.jp [Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259-J2-46, Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan); Patent Attorney, Tokyo Institute of Technology, 4259-J2-46, Nagatsuta-cho, Midori-ku, Yokohama 226-8503 (Japan)

    2012-02-01

    Crystalline BaB{sub 6} (1 0 0) thin films can be fabricated on MgO (1 0 0) substrates by inserting a 2-3 nm-thick epitaxial SrB{sub 6} (1 0 0) buffer layer by pulsed laser deposition (PLD) in ultra-high vacuum (i.e., laser molecular beam epitaxy). Reflection high-energy electron diffraction and X-ray diffraction measurements indicated the heteroepitaxial structure of BaB{sub 6} (1 0 0)/SrB{sub 6} (1 0 0)/MgO (1 0 0) with the single domain of the epitaxial relationship. Conversely, BaB{sub 6} thin films without the buffer layer were not epitaxial instead they developed as polycrystalline films with a random in-plane configuration and some impurity phases. As a result, the buffer layer is considered to greatly affect the initial growth of epitaxial BaB{sub 6} thin films; therefore, in this study, buffering effects have been discussed. From the conventional four-probe measurement, it was observed that BaB{sub 6} epitaxial thin films exhibit n-type semiconducting behavior with a resistivity of 2.90 Multiplication-Sign 10{sup -1} {Omega} cm at room temperature.

  16. A visualization of threading dislocations formation and dynamics in mosaic growth of GaN-based light emitting diode epitaxial layers on (0001) sapphire

    Science.gov (United States)

    Ravadgar, P.; Horng, R. H.; Ou, S. L.

    2012-12-01

    A clear visualization of the origin and characteristics of threading dislocations (TDs) of GaN-based light emitting diode epitaxial layers on (0001) sapphire substrates have been carried out. Special experimental set up and chemical etchant along with field emission scanning electron microscopy are employed to study the dynamics of GaN TDs at different growth stages. Cross-sectional transmission electron microscopy analysis visualized the formation of edge TDs is arising from extension of coalescences at boundaries of different tilting-twining nucleation grains "mosaic growth." Etch pits as representatives of edge TDs are in agreement with previous theoretical models and analyses of TDs core position and characteristics.

  17. Structural and magnetic properties of GaMnAs layers with high Mn-content grown by migration-enhanced epitaxy on GaAs(100) substrates

    Science.gov (United States)

    Sadowski, J.; Mathieu, R.; Svedlindh, P.; Domagała, J. Z.; Bak-Misiuk, J.; Światek, K.; Karlsteen, M.; Kanski, J.; Ilver, L.; Åsklund, H.; Södervall, U.

    2001-05-01

    Ferromagnetic GaMnAs containing up to 10% Mn has been grown by migration-enhanced epitaxy at a substrate temperature of 150 °C. The lattice constant of hypothetical zinc-blende structure MnAs is determined to be 5.90 Å, which deviates somewhat from previously reported values. This deviation is ascribed to growth-condition-dependent density of point defects. Magnetization measurements showed an onset of ferromagnetic ordering around 75 K for the GaMnAs layer with 10% Mn. This means that the trend of falling Curie temperatures with increasing Mn concentrations above 5.3% is broken.

  18. GaN Epitaxial Layer Grown with Conductive Al(x)Ga(1-x)N Buffer Layer on SiC Substrate Using Metal Organic Chemical Vapor Deposition.

    Science.gov (United States)

    So, Byeongchan; Lee, Kyungbae; Lee, Kyungjae; Heo, Cheon; Pyeon, Jaedo; Ko, Kwangse; Jang, Jongjin; Nam, Okhyun

    2016-05-01

    This study investigated GaN epitaxial layer growth with a conductive Al(x)Ga(1-x)N buffer layer on n-type 4H-SiC by high-temperature metalorganic chemical vapor deposition (HT-MOCVD). The Al composition of the Al(x)Ga(1-x)N buffer was varied from 0% to 100%. In terms of the crystal quality of the GaN layer, 79% Al was the optimal composition of the Al(x)Ga(1-x)N buffer layer in our experiment. A vertical conductive structure was fabricated to measure the current voltage (I-V) characteristics as a function of Al composition, and the I-V curves showed that the resistance increased with increasing Al concentration of the Al(x)Ga(1-x)N buffer layer. PMID:27483845

  19. Initial tests of atomic layer deposition (ALD) coatings for superconducting RF systems

    International Nuclear Information System (INIS)

    Atomic Layer Deposition (ALD) is a method of synthesizing materials in single atomic layers. We are studying this technique as a method of producing highly controlled surfaces for superconducting RF systems. We have begun tests of ALD coatings of single cells that will involve RF measurements of a cell before and after coating at Argonne. In addition to the tests on complete cells, we are also beginning a program of point contact tunneling measurements to determine the properties of the superconductors at the interface between the bulk niobium and the oxide layer. We describe the method, and tests we are beginning with single cell resonators and small samples.

  20. Method of transferring a thin crystalline semiconductor layer

    Science.gov (United States)

    Nastasi, Michael A.; Shao, Lin; Theodore, N. David

    2006-12-26

    A method for transferring a thin semiconductor layer from one substrate to another substrate involves depositing a thin epitaxial monocrystalline semiconductor layer on a substrate having surface contaminants. An interface that includes the contaminants is formed in between the deposited layer and the substrate. Hydrogen atoms are introduced into the structure and allowed to diffuse to the interface. Afterward, the thin semiconductor layer is bonded to a second substrate and the thin layer is separated away at the interface, which results in transferring the thin epitaxial semiconductor layer from one substrate to the other substrate.

  1. Interactions between C and Cu atoms in single-layer graphene: direct observation and modelling.

    Science.gov (United States)

    Kano, Emi; Hashimoto, Ayako; Kaneko, Tomoaki; Tajima, Nobuo; Ohno, Takahisa; Takeguchi, Masaki

    2016-01-01

    Metal doping into the graphene lattice has been studied recently to develop novel nanoelectronic devices and to gain an understanding of the catalytic activities of metals in nanocarbon structures. Here we report the direct observation of interactions between Cu atoms and single-layer graphene by transmission electron microscopy. We document stable configurations of Cu atoms in the graphene sheet and unique transformations of graphene promoted by Cu atoms. First-principles calculations based on density functional theory reveal a reduction of energy barrier that caused rotation of C-C bonds near Cu atoms. We discuss two driving forces, electron irradiation and in situ heating, and conclude that the observed transformations were mainly promoted by electron irradiation. Our results suggest that individual Cu atoms can promote reconstruction of single-layer graphene. PMID:26645468

  2. Atomic-resolution studies of epitaxial strain release mechanisms in L a1.85S r0.15Cu O4 /L a0.67C a0.33Mn O3 superlattices

    Science.gov (United States)

    Biškup, N.; Das, S.; Gonzalez-Calbet, J. M.; Bernhard, C.; Varela, M.

    2015-05-01

    In this paper we present an atomic-resolution electron microscopy study of superlattices (SLs) where the colossal magnetoresistant manganite L a0.67C a0.33Mn O3 (LCMO) and the high critical temperature superconducting cuprate L a1.85S r0.15Cu O4 (LSCO) are combined. Although good quality epitaxial growth can be achieved, both the choice of substrate and the relatively large lattice mismatch between these materials (around 2%) have a significant impact on the system properties [Phys. C 468, 991 (2008), 10.1016/j.physc.2008.05.001; Nature (London) 394, 453 (1998), 10.1038/28810]. Our samples, grown by pulsed laser deposition, are epitaxial and exhibit high structural quality. By means of cutting-edge electron microscopy and spectroscopy techniques we still find that the epitaxial strain is accommodated by a combination of defects, such as interface steps and antiphase boundaries in the manganite. These defects result in inhomogeneous strain fields through the samples. Also, some chemical inhomogeneities are detected, up to the point that novel phases nucleate. For example, at the LCMO/LSCO interface the AB O3 -type manganite adopts a tetragonal LSCO-like structure forming localized layers that locally resemble the composition of L a2 /3C a4 /3Mn O4 . Structural distortions are detected in the cuprate as well, which may extend over lateral distances of several unit cells. Finally, we also analyze the influence of the substrate-induced strain by examining superlattices grown on two different substrates: (LaAlO3) 0.3(Sr2AlTaO6 ) 0.7 (LSAT) and LaSrAl O4 (LSAO). We observe that SLs grown on LSAT, which are nonsuperconducting, present reduced values of the c axis compared to superlattices grown on LSAO (which are fully superconducting). This finding points to the fact that the proper distance between copper planes in LSCO is essential in obtaining superconductivity in cuprates.

  3. Thermoelectric material including conformal oxide layers and method of making the same using atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cho, Jung Young; Ahn, Dongjoon; Salvador, James R.; Meisner, Gregory P.

    2016-06-07

    A thermoelectric material includes a substrate particle and a plurality of conformal oxide layers formed on the substrate particle. The plurality of conformal oxide layers has a total oxide layer thickness ranging from about 2 nm to about 20 nm. The thermoelectric material excludes oxide nanoparticles. A method of making the thermoelectric material is also disclosed herein.

  4. Deep levels in a-plane, high Mg-content Mg{sub x}Zn{sub 1-x}O epitaxial layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Guer, Emre [Department of Physics, Faculty of Science, Atatuerk University, Erzurum 25240 (Turkey); 205 Dreese Laboratory, Department of Electrical and Computer Engineering, The Ohio State University, 2015 Neil Avenue, Columbus, Ohio 43210-1272 (United States); Tabares, G.; Hierro, A. [Dpto. Ingenieria Electronica and ISOM, Universidad Politecnica de Madrid, Ciudad Universitaria s/n, 28040 Madrid (Spain); Arehart, A.; Ringel, S. A. [205 Dreese Laboratory, Department of Electrical and Computer Engineering, Ohio State University, 2015 Neil Avenue, Columbus, Ohio 43210-1272 (United States); Chauveau, J. M. [CRHEA-CNRS, 06560 Valbonne (France); University of Nice Sophia Antipolis, ParcValrose, 06102 Nice Cedex 2 (France)

    2012-12-15

    Deep level defects in n-type unintentionally doped a-plane Mg{sub x}Zn{sub 1-x}O, grown by molecular beam epitaxy on r-plane sapphire were fully characterized using deep level optical spectroscopy (DLOS) and related methods. Four compositions of Mg{sub x}Zn{sub 1-x}O were examined with x = 0.31, 0.44, 0.52, and 0.56 together with a control ZnO sample. DLOS measurements revealed the presence of five deep levels in each Mg-containing sample, having energy levels of E{sub c} - 1.4 eV, 2.1 eV, 2.6 V, and E{sub v} + 0.3 eV and 0.6 eV. For all Mg compositions, the activation energies of the first three states were constant with respect to the conduction band edge, whereas the latter two revealed constant activation energies with respect to the valence band edge. In contrast to the ternary materials, only three levels, at E{sub c} - 2.1 eV, E{sub v} + 0.3 eV, and 0.6 eV, were observed for the ZnO control sample in this systematically grown series of samples. Substantially higher concentrations of the deep levels at E{sub v} + 0.3 eV and E{sub c} - 2.1 eV were observed in ZnO compared to the Mg alloyed samples. Moreover, there is a general invariance of trap concentration of the E{sub v} + 0.3 eV and 0.6 eV levels on Mg content, while at least and order of magnitude dependency of the E{sub c} - 1.4 eV and E{sub c} - 2.6 eV levels in Mg alloyed samples.

  5. Interactions between C and Cu atoms in single-layer graphene: direct observation and modelling

    Science.gov (United States)

    Kano, Emi; Hashimoto, Ayako; Kaneko, Tomoaki; Tajima, Nobuo; Ohno, Takahisa; Takeguchi, Masaki

    2015-12-01

    Metal doping into the graphene lattice has been studied recently to develop novel nanoelectronic devices and to gain an understanding of the catalytic activities of metals in nanocarbon structures. Here we report the direct observation of interactions between Cu atoms and single-layer graphene by transmission electron microscopy. We document stable configurations of Cu atoms in the graphene sheet and unique transformations of graphene promoted by Cu atoms. First-principles calculations based on density functional theory reveal a reduction of energy barrier that caused rotation of C-C bonds near Cu atoms. We discuss two driving forces, electron irradiation and in situ heating, and conclude that the observed transformations were mainly promoted by electron irradiation. Our results suggest that individual Cu atoms can promote reconstruction of single-layer graphene.Metal doping into the graphene lattice has been studied recently to develop novel nanoelectronic devices and to gain an understanding of the catalytic activities of metals in nanocarbon structures. Here we report the direct observation of interactions between Cu atoms and single-layer graphene by transmission electron microscopy. We document stable configurations of Cu atoms in the graphene sheet and unique transformations of graphene promoted by Cu atoms. First-principles calculations based on density functional theory reveal a reduction of energy barrier that caused rotation of C-C bonds near Cu atoms. We discuss two driving forces, electron irradiation and in situ heating, and conclude that the observed transformations were mainly promoted by electron irradiation. Our results suggest that individual Cu atoms can promote reconstruction of single-layer graphene. Electronic supplementary information (ESI) available: Three TEM movies, additional TEM data corresponding to movies, calculated models, and lifetime results. See DOI: 10.1039/c5nr05913e

  6. Effect of Ⅲ/Ⅴ Ratio of HT-AlN Buffer Layer on Polarity Selection and Electrical Quality of GaN Films Grown by Radio Frequency Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    ZHONG Fei; CHEN Jia-Rong; WANG Yu-Qi; QIU Kai; LI Xin-Hua; YIN Zhi-Jun; XIE Xin-Jian; WANG Yang; JI Chang-Jian; CAO Xian-Cun; HAN Qi-Feng

    2007-01-01

    @@ We investigate the effect of Al/N ratio of the high temperature (HT) AlN buffer layer on polarity selection and electrical quality of GaN films grown by radio frequency molecular beam epitaxy. The results show that low Al/N ratio results in N-polarity GaN films and intermediate Al/N ratio leads to mixed-polarity GaN films with poor electrical quality. GaN films tend to grow with Ga polarity on Al-rich AlN buffer layers. GaN films with different polarities are confirmed by in-situ reflection high-energy electron diffraction during the growth process.Wet chemical etching, together with atomic force microscopy, also proves the polarity assignments. The optimum value for room-temperature Hall mobility of the Ga-polarity GaN film is 703cm2/V.s, which is superior to the N-polarity and mixed-polarity GaN films.

  7. Gigahertz Dielectric Polarization of Substitutional Single Niobium Atoms in Defective Graphitic Layers.

    Science.gov (United States)

    Zhang, Xuefeng; Guo, Junjie; Guan, Pengfei; Qin, Gaowu; Pennycook, Stephen J

    2015-10-01

    We synthesize two Nb/C composites with an order of magnitude difference in the density of single niobium atoms substituted into defective graphitic layers. The concentration and sites of single Nb atoms are identified using aberration-corrected scanning transmission electron microscopy and density functional theory. Comparing the experimental complex permittivity spectra reveals that a representative dielectric resonance at ∼16  GHz originates from the intrinsic polarization of single Nb atom sites, which is confirmed by theoretical simulations. The single-atom dielectric resonance represents the physical limit of the electromagnetic response of condensed matter, and thus might open up a new avenue for designing electromagnetic wave absorption materials. Single-atom resonance also has important implications in understanding the correlation between the macroscopic dielectric behaviors and the atomic-scale structural origin. PMID:26551823

  8. Epitaxial growth of antiphase boundary free GaAs layer on 300 mm Si(001 substrate by metalorganic chemical vapour deposition with high mobility

    Directory of Open Access Journals (Sweden)

    R. Alcotte

    2016-04-01

    Full Text Available Metal organic chemical vapor deposition of GaAs on standard nominal 300 mm Si(001 wafers was studied. Antiphase boundary (APB free epitaxial GaAs films as thin as 150 nm were obtained. The APB-free films exhibit an improvement of the room temperature photoluminescence signal with an increase of the intensity of almost a factor 2.5. Hall effect measurements show an electron mobility enhancement from 200 to 2000 cm2/V s. The GaAs layers directly grown on industrial platform with no APBs are perfect candidates for being integrated as active layers for nanoelectronic as well as optoelectronic devices in a CMOS environment.

  9. Si衬底上热壁外延制备GaAs单晶薄膜材料%Growth of Monocrystalline GaAs Layer on Si by Hot Wall Epitaxy

    Institute of Scientific and Technical Information of China (English)

    刘翔; 谭红琳; 吴长树; 张鹏翔; 赵德锐; 陈庭金; 廖世坤; 吴刚; 杨家明

    2000-01-01

    This paper reports the growth of GaAs layer on Si substrate by hot wall epitaxy (HWE). Si surface prior to epitaxy of GaAs layer is activated. Then two - step epitaxy is used to achieve GaAs layer. Finally, intermittent multi - layer cycle annealing (IMCA) is implemented to improve morphology and quality of the epitaxial layer. Measurement and analysis by electron probe micro - analysis (EPMA), Raman spectrum, Hall measurement and photo - luminescence (PL) confirm that GaAs layer with thickness of approximately 4 μm has been obtained.%报道了采用热壁外延(HWE)技术,在Si表面生长GaAs薄膜。先通过活化剂活化Si表面,再采取两步生长法外延GaAs单晶薄膜,最后进行断续多层循环退火(IMCA)。经电子探针(EPMA)、Raman光谱、Hall测量和荧光(PL)光谱测试分析,证实在Si表面获得了近4μm厚的GaAs单晶薄膜。

  10. Solid phase epitaxial regrowth of (001) anatase titanium dioxide

    Energy Technology Data Exchange (ETDEWEB)

    Barlaz, David Eitan; Seebauer, Edmund G., E-mail: eseebaue@illinois.edu [Department of Chemical and Biomolecular Engineering, University of Illinois, 600 S Mathews Ave., Urbana, Illinois 61801 (United States)

    2016-03-15

    The growing interest in metal oxide based semiconductor technologies has driven the need to produce high quality epitaxial films of one metal oxide upon another. Largely unrecognized in synthetic efforts is that some metal oxides offer strongly polar surfaces and interfaces that require electrostatic stabilization to avoid a physically implausible divergence in the potential. The present work examines these issues for epitaxial growth of anatase TiO{sub 2} on strontium titanate (001). Solid phase epitaxial regrowth yields only the (001) facet, while direct crystalline growth by atomic layer deposition yields both the (112) and (001). The presence of amorphous TiO{sub 2} during regrowth may provide preferential stabilization for formation of the (001) facet.

  11. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    Energy Technology Data Exchange (ETDEWEB)

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D. [National Renewable Energy Lab., Golden, CO (United States)

    1996-05-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {Angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 x 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 x 10{sup 15} cm{sup {minus}2} for a uniform 1.2 x 10{sup 17}cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {mu}m).

  12. Epitaxial Growth of Graphene on 6H-SiC (0001) by Thermal Annealing

    Institute of Scientific and Technical Information of China (English)

    TANG Jun; LIU Zhong-Liang; KANG Chao-Yang; PAN Hai-Bin; WEI Shi-Qiang; XU Peng-Shou; GAO Yu-Qiang; XU Xian-Gang

    2009-01-01

    An epitaxial graphene (EG) layer is successfully grown on a Si-terminated 6H-SiC (0001) substrate by the method of thermal annealing in an ultrahigh vacuum molecular beam epitaxy chamber.The structure and morphology of the EG sample are characterized by reflection high energy diffraction (RHEED),Raman spectroscopy and atomic force microscopy (AFM).Graphene diffraction streaks can be seen in RHEED.The G and 2D peaks of graphene are clearly observed in the Raman spectrum.The AFM results show that the graphene nominal thickness is about 4-10 layers.

  13. Native defects affecting the Li atom distribution tune the optical emission of ZnO:Li epitaxial thin film

    International Nuclear Information System (INIS)

    It is found that the oxygen vacancy (VO) defect concentration affecting the separation between individual species in LiZn-Lii complex influences the optical emission property of Li0.06Zn0.94O epitaxial thin film grown by pulsed laser deposition. The film grown under low oxygen partial pressure (n-type conductivity)/higher partial pressure (resistive-type) has broad emission at ∼2.99 eV/∼2.1 eV and a narrower emission at 3.63 eV/3.56 eV, respectively. First principle based mBJLDA electronic structure calculation suggests that the emission at 2.99 eV is due to the LiZn-Lii pair complex and the emission at 2.1 eV is when the component species are away from each other

  14. Native defects affecting the Li atom distribution tune the optical emission of ZnO:Li epitaxial thin film

    Science.gov (United States)

    Sahu, R.; Dileep, K.; Loukya, B.; Datta, R.

    2014-02-01

    It is found that the oxygen vacancy (VO) defect concentration affecting the separation between individual species in LiZn-Lii complex influences the optical emission property of Li0.06Zn0.94O epitaxial thin film grown by pulsed laser deposition. The film grown under low oxygen partial pressure (n-type conductivity)/higher partial pressure (resistive-type) has broad emission at ˜2.99 eV/˜2.1 eV and a narrower emission at 3.63 eV/3.56 eV, respectively. First principle based mBJLDA electronic structure calculation suggests that the emission at 2.99 eV is due to the LiZn-Lii pair complex and the emission at 2.1 eV is when the component species are away from each other.

  15. Two-dimensional growth of atomically smooth YBCO epitaxial films deposited by PLD in a pulsed oxygen flow

    International Nuclear Information System (INIS)

    The employment of superconducting thin films as electronic devices seems to be the most probable future application of these materials. For this application, thin films with extremely smooth surface and very good superconducting as well as structural properties are required. We deposited YBCO epitaxial thin films by pulsed laser ablation using a pulsed molecular oxygen flow synchronous with the arrival of the ablated species on the substrate. We studied the dependence of their surface morphology on the deposition pressure and we found an evident improvement in the surface quality by lowering the deposition pressure below 5x10-3 mbar. Films grown in these conditions showed surface roughness lower than 1 A, transition temperatures above 88 K and critical current densities of about 107 A cm-2 at 4.2 K in self-field. (author)

  16. Towards defect-free epitaxial CdTe and MgCdTe layers grown on InSb (001) substrates

    Science.gov (United States)

    Lu, Jing; DiNezza, Michael J.; Zhao, Xin-Hao; Liu, Shi; Zhang, Yong-Hang; Kovacs, Andras; Dunin-Borkowski, Rafal E.; Smith, David J.

    2016-04-01

    A series of three CdTe/MgxCd1-xTe (x~0.24) double heterostructures grown by molecular beam epitaxy on InSb (001) substrates at temperatures in the range of 235-295 °C have been studied using conventional and advanced electron microscopy techniques. Defect analysis based on bright-field electron micrographs indicates that the structure grown at 265 °C has the best structural quality of the series, while structures grown at 30 °C lower or higher temperature show highly defective morphology. Geometric phase analysis of the CdTe/InSb interface for the sample grown at 265 °C reveals minimal interfacial elastic strain, and there is no visible evidence of interfacial defect formation in aberration-corrected electron micrographs of this particular sample. Such high quality CdTe epitaxial layers should provide the basis for applications such as photo-detectors and multi-junction solar cells.

  17. Magnetic and dielectric properties of layered perovskite Gd2Ti2O7 thin film epitaxially stabilized on a perovskite single crystal

    Science.gov (United States)

    Ukita, Takashi; Hirose, Yasushi; Ohno, Sawako; Hatabayashi, Kunitada; Fukumura, Tomoteru; Hasegawa, Tetsuya

    2012-04-01

    Layered perovskite (LP) titanates, Ln2Ti2O7 (Ln = lanthanoids), are ferroelectric materials containing magnetic Ln3+ ions at A-site. Metastable LP-Gd2Ti2O7 was fabricated in epitaxial thin film form on lattice-matched perovskite substrates and its dielectric and magnetic properties were investigated. The (100)-oriented LP-Gd2Ti2O7 films were epitaxially grown on (110) plane of (LaAlO3)0.3-(SrAl0.5Ta0.5O3)0.7 (LSAT) and Nb-doped SrTiO3 by using a pulsed laser deposition method. Piezoresponse force microscope measurements revealed that LP-Gd2Ti2O7 has spontaneous polarization along the b-axis at room temperature, strongly suggesting room temperature ferroelectricity. Magnetization measurements showed paramagnetic behavior with weak antiferromagnetic interaction around 2 K. Small positive magneto-dielectric effect (Δɛ/ɛ ˜ 10-5 order) was also confirmed at 10 K.

  18. Atomic layer deposition of ZnO thin films and dot structures

    International Nuclear Information System (INIS)

    Successful growth of thin films and quantum dots of ZnO by atomic layer deposition (ALD) is reported. Properties of ZnO films produced by four different ALD-procedures and by oxidation of ALD-grown ZnS films are discussed. The use of thin ZnO films as buffer layers for GaN deposition is also shortly described. (author)

  19. Subharmonic excitation in amplitude modulation atomic force microscopy in the presence of adsorbed water layers

    Energy Technology Data Exchange (ETDEWEB)

    Santos, Sergio [Laboratory of Energy and Nanosciences, Masdar Institute of Science and Technology, P.O. BOX 54224, Abu Dhabi (United Arab Emirates); Barcons, Victor [Departament de Disseny i Programacio de Sistemes Electronics, UPC - Universitat Politecnica de Catalunya Av. Bases, 61, 08242 Manresa (Spain); Verdaguer, Albert [Centre d' Investigacio en Nanociencia i Nanotecnologia (CIN2) (CSIC-ICN), Esfera UAB, Campus de la UAB, Edifici CM-7, 08193-Bellaterra, Catalunya (Spain); Chiesa, Matteo [Laboratory of Energy and Nanosciences, Masdar Institute of Science and Technology, P.O. BOX 54224, Abu Dhabi (United Arab Emirates); Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139-4307 (United States)

    2011-12-01

    In ambient conditions, nanometric water layers form on hydrophilic surfaces covering them and significantly changing their properties and characteristics. Here we report the excitation of subharmonics in amplitude modulation atomic force microscopy induced by intermittent water contacts. Our simulations show that there are several regimes of operation depending on whether there is perturbation of water layers. Single period orbitals, where subharmonics are never induced, follow only when the tip is either in permanent contact with the water layers or in pure noncontact where the water layers are never perturbed. When the water layers are perturbed subharmonic excitation increases with decreasing oscillation amplitude. We derive an analytical expression which establishes whether water perturbations compromise harmonic motion and show that the predictions are in agreement with numerical simulations. Empirical validation of our interpretation is provided by the observation of a range of values for apparent height of water layers when subharmonic excitation is predicted.

  20. Interlayer breathing and shear modes in NbSe2 atomic layers

    Science.gov (United States)

    He, Rui; van Baren, Jeremiah; Yan, Jia-An; Xi, Xiaoxiang; Ye, Zhipeng; Ye, Gaihua; Lu, I.-Hsi; Leong, S. M.; Lui, C. H.

    2016-09-01

    Atomically thin NbSe2 is a metallic layered transition metal dichalcogenide with novel charge-density-wave (CDW) and superconductive phases. Properties of NbSe2 atomic layers are sensitive to interlayer coupling. Here we investigate the interlayer phonons of few-layer NbSe2 by ultralow-frequency Raman spectroscopy. We observe both the interlayer breathing modes and shear modes at frequencies below 40 cm‑1 for samples of 2–15 layers. Their frequency, Raman activity, and environmental instability depend systematically on the layer number. We account for these results by a combination of linear-chain model, group theory and first-principles calculations. We find that, although NbSe2 has different stacking order from MoS2, MoSe2, WS2 and WSe2, they share the same crystal symmetry groups and exhibit similar Raman selection rules for interlayer phonons. In addition, the interlayer phonon modes evolve smoothly from T = 300 to 8 K, with no observable response to the CDW formation in NbSe2. This finding indicates that the atomic registry between adjacent NbSe2 layers is well preserved in the CDW transition.

  1. Interlayer breathing and shear modes in NbSe2 atomic layers

    Science.gov (United States)

    He, Rui; van Baren, Jeremiah; Yan, Jia-An; Xi, Xiaoxiang; Ye, Zhipeng; Ye, Gaihua; Lu, I.-Hsi; Leong, S. M.; Lui, C. H.

    2016-09-01

    Atomically thin NbSe2 is a metallic layered transition metal dichalcogenide with novel charge-density-wave (CDW) and superconductive phases. Properties of NbSe2 atomic layers are sensitive to interlayer coupling. Here we investigate the interlayer phonons of few-layer NbSe2 by ultralow-frequency Raman spectroscopy. We observe both the interlayer breathing modes and shear modes at frequencies below 40 cm-1 for samples of 2-15 layers. Their frequency, Raman activity, and environmental instability depend systematically on the layer number. We account for these results by a combination of linear-chain model, group theory and first-principles calculations. We find that, although NbSe2 has different stacking order from MoS2, MoSe2, WS2 and WSe2, they share the same crystal symmetry groups and exhibit similar Raman selection rules for interlayer phonons. In addition, the interlayer phonon modes evolve smoothly from T = 300 to 8 K, with no observable response to the CDW formation in NbSe2. This finding indicates that the atomic registry between adjacent NbSe2 layers is well preserved in the CDW transition.

  2. Atomic-layer soft plasma etching of MoS2.

    Science.gov (United States)

    Xiao, Shaoqing; Xiao, Peng; Zhang, Xuecheng; Yan, Dawei; Gu, Xiaofeng; Qin, Fang; Ni, Zhenhua; Han, Zhao Jun; Ostrikov, Kostya Ken

    2016-01-01

    Transition from multi-layer to monolayer and sub-monolayer thickness leads to the many exotic properties and distinctive applications of two-dimensional (2D) MoS2. This transition requires atomic-layer-precision thinning of bulk MoS2 without damaging the remaining layers, which presently remains elusive. Here we report a soft, selective and high-throughput atomic-layer-precision etching of MoS2 in SF6 + N2 plasmas with low-energy (MoS2 layers are removed uniformly across domains with vastly different initial thickness, without affecting the underlying SiO2 substrate and the remaining MoS2 layers. The etching rates can be tuned to achieve complete MoS2 removal and any desired number of MoS2 layers including monolayer. Layer-dependent vibrational and photoluminescence spectra of the etched MoS2 are also demonstrated. This soft plasma etching technique is versatile, scalable, compatible with the semiconductor manufacturing processes, and may be applicable for a broader range of 2D materials and intended device applications.

  3. Studies of deep level centers determining the diffusion length in epitaxial layers and crystals of undoped n-GaN

    Science.gov (United States)

    Lee, In-Hwan; Polyakov, A. Y.; Smirnov, N. B.; Yakimov, E. B.; Tarelkin, S. A.; Turutin, A. V.; Shemerov, I. V.; Pearton, S. J.

    2016-05-01

    A wide variety of parameters were measured for undoped n-GaN grown by hydride vapor phase epitaxy and compared to n-GaN films grown by conventional and lateral overgrowth metalorganic chemical vapor deposition. The parameters included deep level electron and hole trap spectra, microcathodoluminescence, electron beam induced current, diffusion length, and electron capture cross section from the dependence of the low temperature persistent photocapacitance on forward bias injection pulse duration. The results show a prominent role of electron traps with levels near Ec-0.56 eV in limiting the lifetime and diffusion length values in all these materials.

  4. Distinguishing plasmonic absorption modes by virtue of inversed architectures with tunable atomic-layer-deposited spacer layer

    International Nuclear Information System (INIS)

    We demonstrated the distinguishing between plasmonic absorption modes by exploiting an inversed architecture with tunable atomic-layer-deposited dielectric spacer layer. The dielectric spacer layer was manipulated between the bottom metal–nanoparticle monolayer and the upper metal film to inspect the contributions of metal nanoparticles and dielectric film in a step-by-step manner. The experimental and simulated differences between the two peak absorption positions (Δf) and between the corresponding half width at half maxima (Δw) confirmed the evolutions of gap plasmon and interference-enhanced local surface plasmon resonance absorption modes in the plasmonic metamaterial absorbers (PMAs), which were useful for understanding the underlying mechanism of amorphous PMAs. (paper)

  5. Direct observation of strain in InAs quantum dots and cap layer during molecular beam epitaxial growth using in situ X-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Shimomura, Kenichi; Ohshita, Yoshio; Kamiya, Itaru, E-mail: kamiya@toyota-ti.ac.jp [Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511 (Japan); Suzuki, Hidetoshi [Faculty of Engineering, University of Miyazaki, 1-1 Gakuen Kibanadai-nishi, Miyazaki 889-2192 (Japan); Sasaki, Takuo; Takahasi, Masamitu [Quantum Beam Science Center, Japan Atomic Energy Agency, Koto 1-1-1, Sayo-cho, Hyogo 679-5148 (Japan)

    2015-11-14

    Direct measurements on the growth of InAs quantum dots (QDs) and various cap layers during molecular beam epitaxy are performed by in situ X-ray diffraction (XRD). The evolution of strain induced both in the QDs and cap layers during capping is discussed based on the XRD intensity transients obtained at various lattice constants. Transients with different features are observed from those obtained during InGaAs and GaAs capping. The difference observed is attributed to In-Ga intermixing between the QDs and the cap layer under limited supply of In. Photoluminescence (PL) wavelength can be tuned by controlling the intermixing, which affects both the strain induced in the QDs and the barrier heights. The PL wavelength also varies with the cap layer thickness. A large redshift occurs by reducing the cap thickness. The in situ XRD observation reveals that this is a result of reduced strain. We demonstrate how such information about strain can be applied for designing and preparing novel device structures.

  6. Epitaxial Cu(001) films grown on a Cr/Ag/Fe/GaAs(001) buffer system

    International Nuclear Information System (INIS)

    We present a procedure to prepare single-crystalline, high-purity Cu(001) films (templates) suitable as substrates for subsequent epitaxial thin-film growth. The template films were grown in a dedicated molecular-beam epitaxy system on a Cr/Ag/Fe/GaAs(001) buffer layer system. Low-energy electron diffraction and X-ray diffraction were applied to determine the surface orientation and the epitaxial relationship between all layers of the stack. Post-annealing at moderate temperatures enhances the quality of the film as shown by low-energy electron diffraction and atomic force microscopy. X-ray photoemission and Auger electron spectroscopy confirm that no atoms of the buffer layers diffuse into the Cu film during the initial preparation and the post-annealing treatment. The completed Cu(001) template system can be exposed to air and afterwards refurbished by Ar+-ion bombardment and annealing, enabling the transfer between vacuum systems. The procedure provides suitable conductive thin film templates for studies of epitaxial thin films, e.g. on the magnetic and magnetotransport properties of Co and Ni based films and multilayers. - Highlights: • Preparation of epitaxial Cu(001) template films on an insulating substrate • Characterization of template structure, orientation, cleanness, and roughness • Template films can be exposed to air and refurbished in different vacuum system. • Template films are suitable for further thin film growth at up to 570 K

  7. GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride

    International Nuclear Information System (INIS)

    A low-temperature passivation method for GaAs surfaces is investigated. Ultrathin AlN layers are deposited by plasma-enhanced atomic-layer-deposition at 200 deg. C on top of near-surface InGaAs/GaAs quantum well structures. A significant passivation effect is seen as shown by up to 30 times higher photoluminescence intensity and up to seven times longer lifetime compared to uncoated reference samples. The improved optical properties are accompanied by a redshift of the quantum well photoluminescence peak likely caused by a combination of the nitridation of the GaAs capping layer and a surface coupling effect.

  8. Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

    NARCIS (Netherlands)

    Knaapen, R.; Poodt, P.; Olieslagers, R.; Lankhorst, A.; Boer, M. van den; Berg, D. van den; Asten, A. van; Roozeboom, F.

    2012-01-01

    A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, an

  9. Atomic-scale structure of single-layer MoS2 nanoclusters

    DEFF Research Database (Denmark)

    Helveg, S.; Lauritsen, J. V.; Lægsgaard, E.;

    2000-01-01

    We have studied using scanning tunneling microscopy (STM) the atomic-scale realm of molybdenum disulfide (MoS2) nanoclusters, which are of interest as a model system in hydrodesulfurization catalysis. The STM gives the first real space images of the shape and edge structure of single-layer MoS2...

  10. Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene.

    Science.gov (United States)

    Roy, Amit K; Dendooven, Jolien; Deduytsche, Davy; Devloo-Casier, Kilian; Ragaert, Kim; Cardon, Ludwig; Detavernier, Christophe

    2015-02-28

    This communication reports an approach based on plasma-enhanced atomic layer deposition of aluminium oxide for the functionalization of polytetrafluoroethylene (PTFE or "Teflon") surfaces. Alternating exposure of PTFE to oxygen plasma and trimethylaluminium causes a permanent hydrophilic effect, and a more than 10-fold improvement of the "glueability" of PTFE to aluminium. PMID:25631168

  11. A simple model for atomic layer doped field-effect transistor (ALD-FET) electronic states

    Energy Technology Data Exchange (ETDEWEB)

    Mora R, M.E. [Centro de Investigaciones en Optica, Unidad Aguascalientes. Juan de Montoro 207, Zona Centro, 20000 Aguascalientes (Mexico); Gaggero S, L.M. [Escuela de Fisica, Universidad Autonoma de Zacatecas, Av. Preparatoria 301, 98060 Zacatecas (Mexico)

    1998-12-31

    We propose a simple potential model based on the Thomas-Fermi approximation to reproduce the main properties of the electronic structure of an atomic layer doped field effect transistor. Preliminary numerical results for a Si-based ALD-FET justify why bound electronic states are not observed in the experiment. (Author)

  12. Transparent conductive gas-permeation barriers on plastics by atomic layer deposition.

    Science.gov (United States)

    Chou, Chun-Ting; Yu, Pei-Wei; Tseng, Ming-Hung; Hsu, Che-Chen; Shyue, Jing-Jong; Wang, Ching-Chiun; Tsai, Feng-Yu

    2013-03-25

    A mixed-deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10(-4) W cm), optical transparency (>85% from 400-1800 nm), and moisture-barrier property (water vapor transmission rate = 6.3 × 10(-6) g m(-2) day(-1)). PMID:23386315

  13. In-situ RHEED analysis of atomic layer deposition and characterization of AL203 gate dielectrics

    NARCIS (Netherlands)

    Bankras, R.G.; Aarnink, A.A.I.; Holleman, J.; Schmitz, J.

    2003-01-01

    A new custom designed reactor was realized at the MESA+ cleanroom to fabricate high-k dielectrics using atomic layer deposition (ALD). Key features of the reactor are: a small reactor volume, in-situ RHEED analysis and low background pressure. The effect of precursor and purge pulse times is discuss

  14. Atomic layer deposition of platinum clusters on titania nanoparticles at atmospheric pressure

    NARCIS (Netherlands)

    Goulas, A.; Van Ommen, J.R.

    2013-01-01

    We report the fabrication of platinum nanoclusters with a narrow size distribution on TiO2 nanoparticles using atomic layer deposition. With MeCpPtMe3 and ozone as reactants, the deposition can be carried out at a relatively low temperature of 250 degrees C. Our approach of working with suspended na

  15. Atmospheric spatial atomic layer deposition of in-doped ZnO

    NARCIS (Netherlands)

    Illiberi, A.; Scherpenborg, R.; Roozeboom, F.; Poodt, P.

    2014-01-01

    Indium-doped zinc oxide (ZnO:In) has been grown by spatial atomic layer deposition at atmospheric pressure (spatial-ALD). Trimethyl indium (TMIn), diethyl zinc (DEZ) and deionized water have been used as In, Zn and O precursor, respectively. The metal content of the films is controlled in the range

  16. Spatial atmospheric atomic layer deposition of InxGayZnzO for thin film transistors

    NARCIS (Netherlands)

    Illiberi, A.; Cobb, B.; Sharma, A.; Grehl, T.; Brongersma, H.; Roozeboom, F.; Gelinck, G.; Poodt, P.

    2015-01-01

    We have investigated the nucleation and growth of InGaZnO thin films by spatial atmospheric atomic layer deposition. Diethyl zinc (DEZ), trimethyl indium (TMIn), triethyl gallium (TEGa), and water were used as Zn, In, Ga and oxygen precursors, respectively. The vaporized metal precursors have been c

  17. Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition.

    Science.gov (United States)

    Elliott, Simon D; Dey, Gangotri; Maimaiti, Yasheng; Ablat, Hayrensa; Filatova, Ekaterina A; Fomengia, Glen N

    2016-07-01

    Recent progress in the simulation of the chemistry of atomic layer deposition (ALD) is presented for technologically important materials such as alumina, silica, and copper metal. Self-limiting chemisorption of precursors onto substrates is studied using density functional theory so as to determine reaction pathways and aid process development. The main challenges for the future of ALD modeling are outlined.

  18. Fabrication and surface passivation of porous 6H-SiC by atomic layer deposited films

    DEFF Research Database (Denmark)

    Lu, Weifang; Ou, Yiyu; Petersen, Paul Michael;

    2016-01-01

    photoluminescence was observed and the etching process was optimized in terms of etching time and thickness. Enormous enhancement as well as redshift and broadening of photoluminescence spectra were observed after the passivation by atomic layer deposited Al2O3 and TiO2 films. No obvious luminescence was observed...

  19. Electrocatalytic activity of atomic layer deposited Pt–Ru catalysts onto N-doped carbon nanotubes

    DEFF Research Database (Denmark)

    Johansson, Anne-Charlotte Elisabeth Birgitta; Larsen, Jackie Vincent; Verheijen, Marcel A.;

    2014-01-01

    Pt–Ru catalysts of various compositions, between 0 and 100at.% of Ru, were deposited onto N-doped multi-walled carbon nanotubes (N-CNTs) by atomic layer deposition (ALD) at 250°C. The Pt and Ru precursors were trimethyl(methylcyclopentadienyl)platinum (MeCpPtMe3) and bis...

  20. The kinetics of low-temperature spatial atomic layer deposition of aluminum oxide

    NARCIS (Netherlands)

    Poodt, P.W.G.; Illiberi, A.; Roozeboom, F.

    2013-01-01

    Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in functional thin film deposition for applications such as flexible electronics. This, however, requires low-temperature deposition processes. We have investigated the kinetics of low-temperature (< 100 C) spat

  1. Experimental determination of electron-hole pair creation energy in 4H-SiC epitaxial layer: An absolute calibration approach

    Energy Technology Data Exchange (ETDEWEB)

    Chaudhuri, Sandeep K.; Zavalla, Kelvin J.; Mandal, Krishna C. [Department of Electrical Engineering, University of South Carolina, Columbia, South Carolina 29208 (United States)

    2013-01-21

    Electron-hole pair creation energy ({epsilon}) has been determined from alpha spectroscopy using 4H-SiC epitaxial layer Schottky detectors and a pulser calibration technique. We report an experimentally obtained {epsilon} value of 7.28 eV in 4H-SiC. The obtained {epsilon} value and theoretical models were used to calculate a Fano factor of 0.128 for 5.48 MeV alpha particles. The contributions of different factors to the ultimate alpha peak broadening in pulse-height spectra were determined using the calculated {epsilon} value and Monte-Carlo simulations. The determined {epsilon} value was verified using a drift-diffusion model of variation of charge collection efficiency with applied bias.

  2. Study of the conduction-type conversion in Si-doped (631)A GaAs layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Cruz-Hernandez, E.; Vazquez-Cortes, D.; Mendez-Garcia, V.H. [Coordinacion para la Innovacion y Aplicacion de la Ciencia y Tecnologia, Universidad Autonoma de San Luis Potosi, Av. Sierra Leona 550, Col. Lomas 2a. Seccion, San Luis Potosi, S.L.P. 78210 (Mexico); Shimomura, S. [Graduate School of Science and Engineering, Ehime University, 3 Bukyo-cho, Matsuyama, Ehime 790-8577 (Japan); Lopez-Lopez, M. [Physics Department, Centro de Investigacion y de Estudios Avanzados del IPN, Apartado Postal 14-740, Mexico DF 07000 (Mexico)

    2011-02-15

    We report the Si-doping of GaAs (631)A layers grown by molecular beam epitaxy under different As overpressure. From Hall effect measurements, we have found that the increase of the As pressure induces conduction conversion from p- to n-type, which is presumably related to lattice site switching of Si occupying an As site (where Si is acceptor) to a Ga site (where Si acts as a donor). This conversion is also studied by photoluminescence (PL) spectroscopy. The sharp conductivity conversion, at a critical As pressure value of 1.4-1.7 x 10{sup -5} mbar is reflected in the optical properties of the samples by a change of As vacancy defects into pairs of Ga vacancy and Ga antisite defects. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Design of step composition gradient thin film transistor channel layers grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Ahn, Cheol Hyoun; Hee Kim, So; Gu Yun, Myeong; Koun Cho, Hyung, E-mail: chohk@skku.edu [School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)

    2014-12-01

    In this study, we proposed the artificially designed channel structure in oxide thin-film transistors (TFTs) called a “step-composition gradient channel.” We demonstrated Al step-composition gradient Al-Zn-O (AZO) channel structures consisting of three AZO layers with different Al contents. The effects of stacking sequence in the step-composition gradient channel on performance and electrical stability of bottom-gate TFT devices were investigated with two channels of inverse stacking order (ascending/descending step-composition). The TFT with ascending step-composition channel structure (5 → 10 → 14 at. % Al composition) showed relatively negative threshold voltage (−3.7 V) and good instability characteristics with a reduced threshold voltage shift (Δ 1.4 V), which was related to the alignment of the conduction band off-set within the channel layer depending on the Al contents. Finally, the reduced Al composition in the initial layer of ascending step-composition channel resulted in the best field effect mobility of 4.5 cm{sup 2}/V s. We presented a unique active layer of the “step-composition gradient channel” in the oxide TFTs and explained the mechanism of adequate channel design.

  4. Role of atomic terraces and steps in the electron transport properties of epitaxial graphene grown on SiC

    Directory of Open Access Journals (Sweden)

    H. Kuramochi

    2012-03-01

    Full Text Available Thermal decomposition of vicinal SiC substrates with self-organized periodic nanofacets is a promising method to produce large graphene sheets toward the commercial exploitation of graphene's superior electronic properties. The epitaxial graphene films grown on vicinal SiC comprise two distinct regions of terrace and step; and typically exhibit anisotropic electron transport behavior, although limited areas in the graphene film showed ballistic transport. To evaluate the role of terraces and steps in electron transport properties, we compared graphene samples with terrace and step regions grown on 4H-SiC(0001. Arrays of field effect transistors were fabricated on comparable graphene samples with their channels parallel or perpendicular to the nanofacets to identify the source of measured reduced mobility. Minimum conductivity and electron mobility increased with the larger proportional terrace region area; therefore, the terrace region has superior transport properties to step regions. The measured electron mobility in the terrace region, ∼1000 cm2/Vs, is 10 times larger than that in the step region, ∼100 cm2/Vs. We conclusively determine that parasitic effects originate in regions of graphene that grow over step edges in 4H-SiC(0001.

  5. Assessing the influence of the vertical epitaxial layer design on the lateral beam quality of high-power broad area diode lasers

    Science.gov (United States)

    Winterfeldt, M.; Rieprich, J.; Knigge, S.; Maaßdorf, A.; Hempel, M.; Kernke, R.; Tomm, J. W.; Erbert, G.; Crump, P.

    2016-03-01

    GaAs-based high-power broad-area diode lasers deliver optical output powers Popt > 10W with efficiency > 60%. However, their application is limited due to poor in-plane beam parameter product BPPlat=0.25×Θ95%×w95% (Θ95% and w95% are emission angle and aperture, 95% power content). We present experimental investigations on λ = 9xx nm broad area lasers that aim to identify regulating factors of the BPPlat connected to the epitaxial layer design. First, we assess the thermal lens of vertical designs with varying asymmetry, using thermal camera images to determine its strength. Under study are an extreme-double-asymmetric (EDAS) vertical structure and a reference (i.e. more symmetric) design. The lateral thermal profiles clearly show that BPPlat increase is correlated to the bowing of the thermal lens. The latter is derived out of a quadratic temperature fit in the active region beneath the current injection of the laser device and depends on the details of the epitaxial layers. Second, we test the benefit of low modal gain factor Γg0, predicted to improve BPPlat via a suppression of filamentation. EDAS-based lasers with single quantum well (SQW) and double quantum well (DQW) active regions were compared, with 2.5x reduced Γg0, for 2.2x reduced filament gain. However, no difference is seen in measured BPPlat, giving evidence that filamentary processes are no longer a limit. In contrast, devices with lower Γg0 demonstrate an up to twofold reduced near field modulation depth, potentially enabling higher facet loads and increased device facet reliability, when operated near to the COD limit.

  6. Interactions between fluorescence of atomically layered graphene oxide and metallic nanoparticles

    Science.gov (United States)

    Wang, Yu; Li, Shao-Sian; Yeh, Yun-Chieh; Yu, Chen-Chieh; Chen, Hsuen-Li; Li, Feng-Chieh; Chang, Yu-Ming; Chen, Chun-Wei

    2013-01-01

    Graphene oxide (GO) demonstrates interesting photoluminescence (PL) because of its unique heterogeneous atomic structure, which consists of variable sp2- and sp3-bonded carbons. In this study, we report the interaction between the luminescence of GO ranging from a single atomic layer to few-layered thin films and localized surface plasmon resonance (LSPR) from silver nanoparticles (Ag NPs). The photoluminescence of GO in the vicinity of the Ag NPs is enhanced significantly due to the near-field plasmonic effect by coupling electron-hole pairs of GO with oscillating electrons in Ag NPs, leading to an increased PL intensity and a decreased PL decay lifetime. The maxima 30-fold enhancement in PL intensity is obtained with an optimized film thickness of GO, and the luminescence image from a single atomic layer GO sheet is successfully observed with the assistance of the LSPR effect. The results provide an ideal platform for exploring the interactions between the fluorescence of two-dimensional layered materials and the LSPR effect.Graphene oxide (GO) demonstrates interesting photoluminescence (PL) because of its unique heterogeneous atomic structure, which consists of variable sp2- and sp3-bonded carbons. In this study, we report the interaction between the luminescence of GO ranging from a single atomic layer to few-layered thin films and localized surface plasmon resonance (LSPR) from silver nanoparticles (Ag NPs). The photoluminescence of GO in the vicinity of the Ag NPs is enhanced significantly due to the near-field plasmonic effect by coupling electron-hole pairs of GO with oscillating electrons in Ag NPs, leading to an increased PL intensity and a decreased PL decay lifetime. The maxima 30-fold enhancement in PL intensity is obtained with an optimized film thickness of GO, and the luminescence image from a single atomic layer GO sheet is successfully observed with the assistance of the LSPR effect. The results provide an ideal platform for exploring the

  7. Low temperature formation of higher-k cubic phase HfO{sub 2} by atomic layer deposition on GeO{sub x}/Ge structures fabricated by in-situ thermal oxidation

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, R., E-mail: zhang@mosfet.t.u-tokyo.ac.jp [School of Engineering, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656 (Japan); Department of Information Science and Electronic Engineering, Zhejiang University, 38 Zheda Road, Hangzhou 310027 (China); Huang, P.-C.; Taoka, N.; Yokoyama, M.; Takenaka, M.; Takagi, S. [School of Engineering, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656 (Japan)

    2016-02-01

    We have demonstrated a low temperature formation (300 °C) of higher-k HfO{sub 2} using atomic layer deposition (ALD) on an in-situ thermal oxidation GeO{sub x} interfacial layer. It is found that the cubic phase is dominant in the HfO{sub 2} film with an epitaxial-like growth behavior. The maximum permittivity of 42 is obtained for an ALD HfO{sub 2} film on a 1-nm-thick GeO{sub x} form by the in-situ thermal oxidation. It is suggested from physical analyses that the crystallization of cubic phase HfO{sub 2} can be induced by the formation of six-fold crystalline GeO{sub x} structures in the underlying GeO{sub x} interfacial layer.

  8. Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor

    Energy Technology Data Exchange (ETDEWEB)

    Wei, Daming [Kansas State University; Hossain, T [Kansas State University; Garces, N. Y. [Naval Research Laboratory, Washington, D.C.; Nepal, N. [Naval Research Laboratory, Washington, D.C.; Meyer III, Harry M [ORNL; Kirkham, Melanie J [ORNL; Eddy, C.R., Jr. [Naval Research Laboratory, Washington, D.C.; Edgar, J H [Kansas State University

    2013-01-01

    This paper reports on the influence of temperature on the structure, composition, and electrical properties of TiO2 thin films deposited on n-type silicon (100) by atomic layer deposition (ALD). TiO2 layers around 20nm thick, deposited at temperatures ranging from 100 to 300 C, were studied. Samples deposited at 250 C and 200 C had the most uniform coverage as determined by atomic force microscopy. The average carbon concentration throughout the oxide layer and at the TiO2/Si interface was lowest at 200 C. Metal oxide semiconductor capacitors (MOSCAPs) were fabricated, and profiled by capacitance-voltage techniques. Negligible hysteresis was observed from a capacitance-voltage plot and the capacitance in the accumulation region was constant for the sample prepared at a 200 C ALD growth temperature. The interface trap density was on the order of 1013 eV-1cm-2 regardless of the deposition temperature.

  9. Raman scattering and anomalous Stokes–anti-Stokes ratio in MoTe2 atomic layers

    Science.gov (United States)

    Goldstein, Thomas; Chen, Shao-Yu; Tong, Jiayue; Xiao, Di; Ramasubramaniam, Ashwin; Yan, Jun

    2016-06-01

    Stokes and anti-Stokes Raman scattering are performed on atomic layers of hexagonal molybdenum ditelluride (MoTe2), a prototypical transition metal dichalcogenide (TMDC) semiconductor. The data reveal all six types of zone center optical phonons, along with their corresponding Davydov splittings, which have been challenging to see in other TMDCs. We discover that the anti-Stokes Raman intensity of the low energy layer-breathing mode becomes more intense than the Stokes peak under certain experimental conditions, and find the effect to be tunable by excitation frequency and number of atomic layers. These observations are interpreted as a result of resonance effects arising from the C excitons in the vicinity of the Brillouin zone center in the photon-electron-phonon interaction process.

  10. Raman scattering and anomalous Stokes-anti-Stokes ratio in MoTe2 atomic layers.

    Science.gov (United States)

    Goldstein, Thomas; Chen, Shao-Yu; Tong, Jiayue; Xiao, Di; Ramasubramaniam, Ashwin; Yan, Jun

    2016-01-01

    Stokes and anti-Stokes Raman scattering are performed on atomic layers of hexagonal molybdenum ditelluride (MoTe2), a prototypical transition metal dichalcogenide (TMDC) semiconductor. The data reveal all six types of zone center optical phonons, along with their corresponding Davydov splittings, which have been challenging to see in other TMDCs. We discover that the anti-Stokes Raman intensity of the low energy layer-breathing mode becomes more intense than the Stokes peak under certain experimental conditions, and find the effect to be tunable by excitation frequency and number of atomic layers. These observations are interpreted as a result of resonance effects arising from the C excitons in the vicinity of the Brillouin zone center in the photon-electron-phonon interaction process. PMID:27324297

  11. Analysis of layer-by-layer thin-film oxide growth using RHEED and Atomic Force Microscopy

    Science.gov (United States)

    Adler, Eli; Sullivan, M. C.; Gutierrez-Llorente, Araceli; Joress, H.; Woll, A.; Brock, J. D.

    2015-03-01

    Reflection high energy electron diffraction (RHEED) is commonly used as an in situ analysis tool for layer-by-layer thin-film growth. Atomic force microscopy is an equally common ex situ tool for analysis of the film surface, providing visual evidence of the surface morphology. During growth, the RHEED intensity oscillates as the film surface changes in roughness. It is often assumed that the maxima of the RHEED oscillations signify a complete layer, however, the oscillations in oxide systems can be misleading. Thus, using only the RHEED maxima is insufficient. X-ray reflectivity can also be used to analyze growth, as the intensity oscillates in phase with the smoothness of the surface. Using x-ray reflectivity to determine the thin film layer deposition, we grew three films where the x-ray and RHEED oscillations were nearly exactly out of phase and halted deposition at different points in the growth. Pre-growth and post-growth AFM images emphasize the fact that the maxima in RHEED are not a justification for determining layer completion. Work conducted at the Cornell High Energy Synchrotron Source (CHESS) supported by NSF Awards DMR-1332208 and DMR-0936384 and the Cornell Center for Materials Research Shared Facilities are supported through DMR-1120296.

  12. Influence of atomic layer deposition Al2O3 nano-layer on the surface passivation of silicon solar cells

    International Nuclear Information System (INIS)

    A stack of Al2O3/SiNx dual layer was applied for the back side surface passivation of p-type multi-crystalline silicon solar cells, with laser-opened line metal contacts, forming a local aluminum back surface field (local Al-BSF) structure. A slight amount of Al2O3, wrapping around to the front side of the wafer during the thermal atomic layer deposition process, was found to have a negative influence on cell performance. The different process flow was found to lead to a different cell performance, because of the Al2O3 wrapping around the front surface. The best cell performance, with an absolute efficiency gain of about 0.6% compared with the normal full Al-BSF structure solar cell, was achieved when the Al2O3 layer was deposited after the front surface of the wafer had been covered by a SiNx layer. We discuss the possible reasons for this phenomenon, and propose three explanations as the Ag paste, being hindered from firing through the front passivation layer, degraded the SiNx passivation effect and the Al2O3 induced an inversion effect on the front surface. Characterization methods like internal quantum efficiency and contact resistance scanning were used to assist our understanding of the underlying mechanisms. (semiconductor physics)

  13. Semiconductors and semimetals epitaxial microstructures

    CERN Document Server

    Willardson, Robert K; Beer, Albert C; Gossard, Arthur C

    1994-01-01

    Newly developed semiconductor microstructures can now guide light and electrons resulting in important consequences for state-of-the-art electronic and photonic devices. This volume introduces a new generation of epitaxial microstructures. Special emphasis has been given to atomic control during growth and the interrelationship between the atomic arrangements and the properties of the structures.Key Features* Atomic-level control of semiconductor microstructures* Molecular beam epitaxy, metal-organic chemical vapor deposition* Quantum wells and quantum wires* Lasers, photon(IR)detectors, heterostructure transistors

  14. Effect of AlN buffer layer properties on the morphology and polarity of GaN nanowires grown by molecular beam epitaxy

    International Nuclear Information System (INIS)

    Low-temperature AlN buffer layers grown via plasma-assisted molecular beam epitaxy on Si (111) were found to significantly affect the subsequent growth morphology of GaN nanowires. The AlN buffer layers exhibited nanowire-like columnar protrusions, with their size, shape, and tilt determined by the AlN V/III flux ratio. GaN nanowires were frequently observed to adopt the structural characteristics of the underlying AlN columns, including the size and the degree of tilt. Piezoresponse force microscopy and polarity-sensitive etching indicate that the AlN films and the protruding columns have a mixed crystallographic polarity. Convergent beam electron diffraction indicates that GaN nanowires are Ga-polar, suggesting that Al-polar columns are nanowire nucleation sites for Ga-polar nanowires. GaN nanowires of low density could be grown on AlN buffers that were predominantly N-polar with isolated Al-polar columns, indicating a high growth rate for Ga-polar nanowires and suppressed growth of N-polar nanowires under typical growth conditions. AlN buffer layers grown under slightly N-rich conditions (V/III flux ratio = 1.0 to 1.3) were found to provide a favorable growth surface for low-density, coalescence-free nanowires.

  15. Effects of buffer layer preparation and Bi concentration on InGaAsBi epilayers grown by gas source molecular beam epitaxy

    International Nuclear Information System (INIS)

    The effect of using an In0.53Ga0.47As buffer layer on the crystalline quality of InGaAsBi epilayer with Bi concentration up to 3.1% grown by gas source molecular beam epitaxy was investigated. It is found that use of the buffer layer has a dramatic effect on the improvement of surface morphology, structural, electrical and optical properties of InGaAsBi epilayers. Bi incorporation in InGaAs up to a concentration of 3.1% causes no degradation of the electron mobility and induces p-type carriers that compensate the background n-type carriers resulting in mobility enhancement with increasing Bi concentration. With the buffer layer preparation, a maximum electron mobility of 5550 cm2 V–1 s–1 at room temperature is demonstrated in InGaAsBi with x Bi = 3.1%, which is the highest value reported in InGaAsBi with x Bi > 2.5%. (paper)

  16. Charged particle detection performances of CMOS pixel sensors produced in a 0.18 um process with a high resistivity epitaxial layer

    CERN Document Server

    Senyukov, Serhiy; Besson, Auguste; Claus, Gilles; Cousin, Loic; Dorokhov, Andrei; Dulinski, Wojciech; Goffe, Mathieu; Hu-Guo, Christine; Winter, Marc

    2013-01-01

    The apparatus of the ALICE experiment at CERN will be upgraded in 2017/18 during the second long shutdown of the LHC (LS2). A major motivation for this upgrade is to extend the physics reach for charmed and beauty particles down to low transverse momenta. This requires a substantial improvement of the spatial resolution and the data rate capability of the ALICE Inner Tracking System (ITS). To achieve this goal, the new ITS will be equipped with 50 um thin CMOS Pixel Sensors (CPS) covering either the 3 innermost layers or all the 7 layers of the detector. The CPS being developed for the ITS upgrade at IPHC (Strasbourg) is derived from the MIMOSA 28 sensor realised for the STAR-PXL at RHIC in a 0.35 um CMOS process. In order to satisfy the ITS upgrade requirements in terms of readout speed and radiation tolerance, a CMOS process with a reduced feature size and a high resistivity epitaxial layer should be exploited. In this respect, the charged particle detection performance and radiation hardness of the TowerJa...

  17. Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

    Science.gov (United States)

    Fourreau, Y.; Pantzas, K.; Patriarche, G.; Destefanis, V.

    2016-09-01

    The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm-2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.

  18. Nondestructive Characterization of Residual Threading Dislocation Density in HgCdTe Layers Grown on CdZnTe by Liquid-Phase Epitaxy

    Science.gov (United States)

    Fourreau, Y.; Pantzas, K.; Patriarche, G.; Destefanis, V.

    2016-05-01

    The performance of mercury cadmium telluride (MCT)-based infrared (IR) focal-plane arrays is closely related to the crystalline perfection of the HgCdTe thin film. In this work, Te-rich, (111)B-oriented HgCdTe epilayers grown by liquid-phase epitaxy on CdZnTe substrates have been studied. Surface atomic steps are shown on as-grown MCT materials using atomic force microscopy (AFM) and white-light interferometry (WLI), suggesting step-flow growth. Locally, quasiperfect surface spirals are also evidenced. A demonstration is given that these spirals are related to the emergence of almost pure screw threading dislocations. A nondestructive and quantitative technique to measure the threading dislocation density is proposed. The technique consists of counting the surface spirals on the as-grown MCT surface from images obtained by either AFM or WLI measurements. The benefits and drawbacks of both destructive—chemical etching of HgCdTe dislocations—and nondestructive surface imaging techniques are compared. The nature of defects is also discussed. Finally, state-of-the-art threading dislocation densities in the low 104 cm-2 range are evidenced by both etch pit density (EPD) and surface imaging measurements.

  19. Plasma jet desorption atomization-atomic fluorescence spectrometry and its application to mercury speciation by coupling with thin layer chromatography.

    Science.gov (United States)

    Liu, Zhifu; Zhu, Zhenli; Zheng, Hongtao; Hu, Shenghong

    2012-12-01

    A novel plasma jet desorption atomization (PJDA) source was developed for atomic fluorescence spectrometry (AFS) and coupled on line with thin layer chromatography (TLC) for mercury speciation. An argon dielectric barrier discharge plasma jet, which is generated inside a 300 μm quartz capillary, interacts directly with the sample being analyzed and is found to desorb and atomize surface mercury species rapidly. The effectiveness of this PJDA surface sampling technique was demonstrated by measuring AFS signals of inorganic Hg(2+), methylmercury (MeHg), and phenylmercury (PhHg) deposited directly on TLC plate. The detection limits of the proposed PJDA-AFS method for inorganic Hg(2+), MeHg, and PhHg were 0.51, 0.29, and 0.34 pg, respectively, and repeatability was 4.7%, 2.2%, and 4.3% for 10 pg Hg(2+), MeHg, and PhHg. The proposed PJDA-AFS was also successfully coupled to TLC for mercury speciation. Under optimized conditions, the measurements of mercury dithizonate (Hg-D), methylmercury dithizonate (MeHg-D), and phenylmercury dithizonate (PhHg-D) could be achieved within 3 min with detection limits as low as 8.7 pg. The combination of TLC with PJDA-AFS provides a simple, cost-effective, relatively high-throughput way for mercury speciation. PMID:23153091

  20. BARK-MIMETIC LAYER-BY-LAYER ASSEMBLED MONTMORILLONITE/POLY(p-AMINOSTYRENE) FLEXIBLE NANOCOMPOSITES SHIELDING ATOMIC OXYGEN EROSION

    Institute of Scientific and Technical Information of China (English)

    Min Gao; Bing-jun Liu; Long-cheng Gao; Peng-gang Yin; Lei Jiang

    2013-01-01

    Inspired by the birch bark,which has multilayered structures,we fabricated layer-by-layer (LbL) assembled montmorillonite (MMT) and poly(p-aminostyrene) (PPAS) nanocomposites on cotton fiber curved surfaces to provide protection from atomic oxygen (AO) erosion.The multilayer coated fibers had high flexibility,uniformity,defect free,ease of preparation and low cost.The AO erosion durability has been dramatically enhanced which was evidenced by testing in the ground-based AO effects simulation facility.And the dimension and surface morphologies of the fibers observed by SEM had few changes,indicating excellent AO erosion resistant ability of the coatings.These results provide us a new method to design fibrous materials exposed directly in low earth orbit environment.

  1. Thin film encapsulation for organic light-emitting diodes using inorganic/organic hybrid layers by atomic layer deposition.

    Science.gov (United States)

    Zhang, Hao; Ding, He; Wei, Mengjie; Li, Chunya; Wei, Bin; Zhang, Jianhua

    2015-01-01

    A hybrid nanolaminates consisting of Al2O3/ZrO2/alucone (aluminum alkoxides with carbon-containing backbones) grown by atomic layer deposition (ALD) were reported for an encapsulation of organic light-emitting diodes (OLEDs). The electrical Ca test in this study was designed to measure the water vapor transmission rate (WVTR) of nanolaminates. We found that moisture barrier performance was improved with the increasing of the number of dyads (Al2O3/ZrO2/alucone) and the WVTR reached 8.5 × 10(-5) g/m(2)/day at 25°C, relative humidity (RH) 85%. The half lifetime of a green OLED with the initial luminance of 1,500 cd/m(2) reached 350 h using three pairs of the Al2O3 (15 nm)/ZrO2 (15 nm)/alucone (80 nm) as encapsulation layers.

  2. Local atomic arrangements and lattice distortions in layered Ge-Sb-Te crystal structures

    Science.gov (United States)

    Lotnyk, Andriy; Ross, Ulrich; Bernütz, Sabine; Thelander, Erik; Rauschenbach, Bernd

    2016-05-01

    Insights into the local atomic arrangements of layered Ge-Sb-Te compounds are of particular importance from a fundamental point of view and for data storage applications. In this view, a detailed knowledge of the atomic structure in such alloys is central to understanding the functional properties both in the more commonly utilized amorphous-crystalline transition and in recently proposed interfacial phase change memory based on the transition between two crystalline structures. Aberration-corrected scanning transmission electron microscopy allows direct imaging of local arrangement in the crystalline lattice with atomic resolution. However, due to the non-trivial influence of thermal diffuse scattering on the high-angle scattering signal, a detailed examination of the image contrast requires comparison with theoretical image simulations. This work reveals the local atomic structure of trigonal Ge-Sb-Te thin films by using a combination of direct imaging of the atomic columns and theoretical image simulation approaches. The results show that the thin films are prone to the formation of stacking disorder with individual building blocks of the Ge2Sb2Te5, Ge1Sb2Te4 and Ge3Sb2Te6 crystal structures intercalated within randomly oriented grains. The comparison with image simulations based on various theoretical models reveals intermixed cation layers with pronounced local lattice distortions, exceeding those reported in literature.

  3. Atomically thin layered NiFe double hydroxides assembled 3D microspheres with promoted electrochemical performances

    Science.gov (United States)

    Li, Xiaomin; Zai, Jiantao; Liu, Yuanyuan; He, Xiaobo; Xiang, Shijie; Ma, Zifeng; Qian, Xuefeng

    2016-09-01

    LDHs in atomic thickness (mono-/bi-layers) usually exhibit novel physicochemical properties, especially in surface-dependent energy storage and catalysis areas. However, the thickness of the commonly reported 2D LDHs is in nanoscale and the bottom-up synthesis of atomically thin LDHs is rarely reported. Herein, high-quality atomically thin layered NiFe-LDHs assembled 3D microspheres were synthesized via a rational designed reaction system, where the formation of atomically thin building blocks was controlled by the synergetic effects of released carbonate anions and butanol. Furthermore, the complexant and solvents played important effects on the process of coprecipitation and the assembling of LDHs. Due to the nature of atomically thin LDHs nanosheets and unique 3D hierarchical structures, the obtained microspheres exhibited excellent electrocatalytic oxygen evolution reaction (OER) activity in alkaline medium with an onset overpotential (0.435 V, which is lower than that of common LDHs) and good durability. The as-prepared 3D NiFe-LDHs microspheres were also firstly used as supercapacitor materials and displayed a high specific capacitance of 1061 F g-1 at the current density of 1 A g-1.

  4. Partially oxidized atomic cobalt layers for carbon dioxide electroreduction to liquid fuel

    Science.gov (United States)

    Gao, Shan; Lin, Yue; Jiao, Xingchen; Sun, Yongfu; Luo, Qiquan; Zhang, Wenhua; Li, Dianqi; Yang, Jinlong; Xie, Yi

    2016-01-01

    Electroreduction of CO2 into useful fuels, especially if driven by renewable energy, represents a potentially ‘clean’ strategy for replacing fossil feedstocks and dealing with increasing CO2 emissions and their adverse effects on climate. The critical bottleneck lies in activating CO2 into the CO2•- radical anion or other intermediates that can be converted further, as the activation usually requires impractically high overpotentials. Recently, electrocatalysts based on oxide-derived metal nanostructures have been shown to enable CO2 reduction at low overpotentials. However, it remains unclear how the electrocatalytic activity of these metals is influenced by their native oxides, mainly because microstructural features such as interfaces and defects influence CO2 reduction activity yet are difficult to control. To evaluate the role of the two different catalytic sites, here we fabricate two kinds of four-atom-thick layers: pure cobalt metal, and co-existing domains of cobalt metal and cobalt oxide. Cobalt mainly produces formate (HCOO-) during CO2 electroreduction; we find that surface cobalt atoms of the atomically thin layers have higher intrinsic activity and selectivity towards formate production, at lower overpotentials, than do surface cobalt atoms on bulk samples. Partial oxidation of the atomic layers further increases their intrinsic activity, allowing us to realize stable current densities of about 10 milliamperes per square centimetre over 40 hours, with approximately 90 per cent formate selectivity at an overpotential of only 0.24 volts, which outperforms previously reported metal or metal oxide electrodes evaluated under comparable conditions. The correct morphology and oxidation state can thus transform a material from one considered nearly non-catalytic for the CO2 electroreduction reaction into an active catalyst. These findings point to new opportunities for manipulating and improving the CO2 electroreduction properties of metal systems

  5. Atomically thick bismuth selenide freestanding single layers achieving enhanced thermoelectric energy harvesting.

    Science.gov (United States)

    Sun, Yongfu; Cheng, Hao; Gao, Shan; Liu, Qinghua; Sun, Zhihu; Xiao, Chong; Wu, Changzheng; Wei, Shiqiang; Xie, Yi

    2012-12-19

    Thermoelectric materials can realize significant energy savings by generating electricity from untapped waste heat. However, the coupling of the thermoelectric parameters unfortunately limits their efficiency and practical applications. Here, a single-layer-based (SLB) composite fabricated from atomically thick single layers was proposed to optimize the thermoelectric parameters fully. Freestanding five-atom-thick Bi(2)Se(3) single layers were first synthesized via a scalable interaction/exfoliation strategy. As revealed by X-ray absorption fine structure spectroscopy and first-principles calculations, surface distortion gives them excellent structural stability and a much increased density of states, resulting in a 2-fold higher electrical conductivity relative to the bulk material. Also, the surface disorder and numerous interfaces in the Bi(2)Se(3) SLB composite allow for effective phonon scattering and decreased thermal conductivity, while the 2D electron gas and energy filtering effect increase the Seebeck coefficient, resulting in an 8-fold higher figure of merit (ZT) relative to the bulk material. This work develops a facile strategy for synthesizing atomically thick single layers and demonstrates their superior ability to optimize the thermoelectric energy harvesting.

  6. Epitaxial Growth of Si(111)/Er2O3(111) Structure on Si(111) by Molecular Beam Epitaxy

    Institute of Scientific and Technical Information of China (English)

    XU Run; TANG Min-Yan; ZHU Yan-Yan; WANG Lin-Jun

    2011-01-01

    The Si overlayers are grown by molecular beam epitaxy on atomically smllth Er2O3(111) films prepared on Si(111) substrates. Single crystalline Si overlayers are achieved and are evident due to the spot-like reflective high energy electron diffraction(RHEED) patterns and x-ray diffraction patterns. The epitaxial relationship of the Si overlayer along the surface with respect to the orientation of EreO3 and the Si substrate is as follows:overgrown Si(111)//Er2O3(111)//Si(111).The rough surface of Si overlayers, as identified by both RHEED patterns and atomic force microscopy images, indicates a three-dimensional growth mode. The reason for this is based on the interfacial energy argument. Further growth of Er2O3 films on this rough Si overlayer leads to the polycrystalline nature of the topmost Er2O3 layer.

  7. Epitaxial growth and properties of La{sub 0.7}Sr{sub 0.3}MnO{sub 3} thin films with micrometer wide atomic terraces

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, Wei; Zhao, Yuelei; Su, Tang; Song, Qi [International Center for Quantum Materials, Peking University, Beijing 100871 (China); Tang, Chi; Shi, Jing, E-mail: jing.shi@ucr.edu [Department of Physics and Astronomy, University of California, Riverside, California 92521 (United States); Han, Wei, E-mail: weihan@pku.edu.cn [International Center for Quantum Materials, Peking University, Beijing 100871 (China); Collaborative Innovation Center of Quantum Matter, Beijing 100871 (China)

    2015-07-13

    La{sub 0.7}Sr{sub 0.3}MnO{sub 3} (LSMO) films with extraordinarily wide atomic terraces are epitaxially grown on SrTiO{sub 3} (100) substrates by pulsed laser deposition. Atomic force microscopy measurements on the LSMO films show that the atomic step is ∼4 Å and the atomic terrace width is more than 2 μm. For a 20 monolayers (MLs) LSMO film, the magnetization is determined to be 255 ± 15 emu/cm{sup 3} at room temperature, corresponding to 1.70 ± 0.11 μ{sub B} per Mn atom. As the thickness of LSMO increases from 8 MLs to 20 MLs, the critical thickness for the temperature dependent insulator-to-metal behavior transition is shown to be 9 MLs. Furthermore, post-annealing in oxygen environment improves the electron transport and magnetic properties of the LSMO films.

  8. Interface energetics and atomic structure of epitaxial La1-xSrxCoO3 on Nb:SrTiO3

    Science.gov (United States)

    Van Overmeere, Quentin; Baniecki, John D.; Yamazaki, Takashi; Ricinschi, Dan; Aso, Hiroyuki; Miyata, Yusuke; Yamada, Hiroaki; Fujimura, Norifumi; Kataoka, Yuji; Imanaka, Yoshihiko

    2015-06-01

    The energetics at oxide semiconductor/La1-xSrxCoO3 heterojunctions, including the respective alignment of the valence and conduction bands, govern charge transfer and have to be determined for the design of future La1-xSrxCoO3-based devices. In this letter, the electronic and atomic structures of epitaxial La1-xSrxCoO3 on Nb-doped strontium titanate are revealed by scanning transmission electron microscopy, electron energy loss spectroscopy, and in situ x-ray and ultra violet photoelectron spectroscopies. For LaCoO3, a valence band (VB) offset of 2.8 ± 0.1 eV is deduced. The large offset is attributed to the orbital contributions of the Co 3d states to the VB maximum of the LaCoO3 thin films, with no evidence of interface dipole contributions. The sensitivity of the valence band orbital character to spin state ordering and oxygen vacancies is assessed using density functional theory.

  9. Atomic-scale structure of single-layer MoS2 nanoclusters

    OpenAIRE

    Helveg, S.; Lauritsen, J.V.; Lægsgaard, E.; Stensgaard, I.; Nørskov, Jens Kehlet; Clausen, B.S, Helveg S; Topsøe, H.; Besenbacher, Flemming

    2000-01-01

    We have studied using scanning tunneling microscopy (STM) the atomic-scale realm of molybdenum disulfide (MoS2) nanoclusters, which are of interest as a model system in hydrodesulfurization catalysis. The STM gives the first real space images of the shape and edge structure of single-layer MoS2 nanoparticles synthesized on Au(lll), and establishes a new picture of the active edge sires of the nanoclusters. The results demonstrate a way to get detailed atomic-scale information on catalysts in ...

  10. Decoupling of epitaxial graphene via gold intercalation probed by dispersive Raman spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Pillai, P. B., E-mail: p.pillai@sheffield.ac.uk, E-mail: m.desouza@sheffield.ac.uk; DeSouza, M., E-mail: p.pillai@sheffield.ac.uk, E-mail: m.desouza@sheffield.ac.uk [Semiconductor Materials and Device Group, Electronic and Electrical Engineering, University of Sheffield, Mappin Street, S1 3JD Sheffield (United Kingdom); Narula, R.; Reich, S. [Department of Physics, Freie Universität Berlin, Arnimallee 14, 14195 Berlin (Germany); Wong, L. Y.; Batten, T. [Renishaw, Old Town, Wotton-under-Edge, GL12 7DW Gloucestershire (United Kingdom); Pokorny, J. [Department of Materials Science and Engineering, Sir Robert Hadfield Building, Mappin Street, S1 3JD Sheffield (United Kingdom); Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Praha 8 (Czech Republic)

    2015-05-14

    Signatures of a superlattice structure composed of a quasi periodic arrangement of atomic gold clusters below an epitaxied graphene (EG) layer are examined using dispersive Raman spectroscopy. The gold-graphene system exhibits a laser excitation energy dependant red shift of the 2D mode as compared to pristine epitaxial graphene. The phonon dispersions in both the systems are mapped using the experimentally observed Raman signatures and a third-nearest neighbour tight binding electronic band structure model. Our results reveal that the observed excitation dependent Raman red shift in gold EG primarily arise from the modifications of the phonon dispersion in gold-graphene and shows that the extent of decoupling of graphene from the underlying SiC substrate can be monitored from the dispersive nature of the Raman 2D modes. The intercalated gold atoms restore the phonon band structure of epitaxial graphene towards free standing graphene.

  11. Atomic Layer Deposited Corrosion Protection: A Path to Stable and Efficient Photoelectrochemical Cells.

    Science.gov (United States)

    Scheuermann, Andrew G; McIntyre, Paul C

    2016-07-21

    A fundamental challenge in developing photoelectrochemical cells for the renewable production of solar chemicals and fuels is the simultaneous requirement of efficient light absorption and robust stability under corrosive conditions. Schemes for corrosion protection of semiconductor photoelectrodes such as silicon using deposited layers were proposed and attempted for several decades, but increased operational lifetimes were either insufficient or the resulting penalties for device efficiency were prohibitive. In recent years, advances in atomic layer deposition (ALD) of thin coatings have made novel materials engineering possible, leading to substantial and simultaneous improvements in stability and efficiency of photoelectrochemical cells. The self-limiting, layer-by-layer growth of ALD makes thin films with low pinhole densities possible and may also provide a path to defect control that can generalize this protection technology to a large set of materials necessary to fully realize photoelectrochemical cell technology for artificial photosynthesis. PMID:27359352

  12. Optical coatings grown by atomic layer deposition for high-power laser applications

    International Nuclear Information System (INIS)

    We prepared optical coatings with low (Al2O3) and high (TiO2) refractive index materials using the sequential chemical reaction process of atomic layer deposition (ALD). Also, we examined the laser damage thresholds of the films for high-power laser applications. The highest damage thresholds were obtained for amorphous films grown at room temperature. For TiO2 and Al2O3 films they equalled 5 and 5.2 J/cm2, respectively. Finally, we employed ALD for growing desired refractive index coatings consisting of alternating nanoscale Al2O3-TiO2 laminated layers. The refractive index of the stack of these layers could be varied linearly from 1.61 to 2.39 by adjusting the thickness of the component layers. (author)

  13. Domain matched epitaxial growth of (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} thin films on (0001) Al{sub 2}O{sub 3} with ZnO buffer layer

    Energy Technology Data Exchange (ETDEWEB)

    Krishnaprasad, P. S., E-mail: pskrishnaprasu@gmail.com, E-mail: mkj@cusat.ac.in; Jayaraj, M. K., E-mail: pskrishnaprasu@gmail.com, E-mail: mkj@cusat.ac.in [Department of Physics, Cochin University of Science and Technology, Kochi-22, Kerala (India); Antony, Aldrin [Department of Applied Physics and Optics, University of Barcelona, Barcelona (Spain); Department of Energy Science and Engineering, IIT Bombay, Mumbai (India); Rojas, Fredy [Department of Applied Physics and Optics, University of Barcelona, Barcelona (Spain)

    2015-03-28

    Epitaxial (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} (BST) thin films have been grown by pulsed laser deposition on (0001) Al{sub 2}O{sub 3} substrate with ZnO as buffer layer. The x-ray ω-2θ, Φ-scan and reciprocal space mapping indicate epitaxial nature of BST thin films. The domain matched epitaxial growth of BST thin films over ZnO buffer layer was confirmed using Fourier filtered high resolution transmission electron microscope images of the film-buffer interface. The incorporation of ZnO buffer layer effectively suppressed the lattice mismatch and promoted domain matched epitaxial growth of BST thin films. Coplanar inter digital capacitors fabricated on epitaxial (111) BST thin films show significantly improved tunable performance over polycrystalline thin films.

  14. Morphology and atomic-scale structure of single-layer WS2 nanoclusters.

    Science.gov (United States)

    Füchtbauer, Henrik G; Tuxen, Anders K; Moses, Poul G; Topsøe, Henrik; Besenbacher, Flemming; Lauritsen, Jeppe V

    2013-10-14

    Two-dimensional sheets of transition metal (Mo and W) sulfides are attracting strong attention due to the unique electronic and optical properties associated with the material in its single-layer form. The single-layer MoS2 and WS2 are already in widespread commercial use in catalytic applications as both hydrotreating and hydrocracking catalysts. Consequently, characterization of the morphology and atomic structure of such particles is of utmost importance for the understanding of the catalytic active phase. However, in comparison with the related MoS2 system only little is known about the fundamental properties of single-layer WS2 (tungstenite). Here, we use an interplay of atom-resolved Scanning Tunneling Microscopy (STM) studies of Au(111)-supported WS2 nanoparticles and calculated edge structures using Density Functional Theory (DFT) to reveal the equilibrium morphology and prevalent edge structures of single-layer WS2. The STM results reveal that the single layer S-W-S sheets adopt a triangular equilibrium shape under the sulfiding conditions of the synthesis, with fully sulfided edges. The predominant edge structures are determined to be the (101[combining macron]0) W-edge, but for the smallest nanoclusters also the (1[combining macron]010) S-edges become important. DFT calculations are used to construct phase diagrams of the WS2 edges, and describe their sulfur and hydrogen coordination under different conditions, and in this way shed light on the catalytic role of WS2 edges.

  15. Three-dimensional spirals of atomic layered MoS2.

    Science.gov (United States)

    Zhang, Liming; Liu, Kaihui; Wong, Andrew Barnabas; Kim, Jonghwan; Hong, Xiaoping; Liu, Chong; Cao, Ting; Louie, Steven G; Wang, Feng; Yang, Peidong

    2014-11-12

    Atomically thin two-dimensional (2D) layered materials, including graphene, boron nitride, and transition metal dichalcogenides (TMDs), can exhibit novel phenomena distinct from their bulk counterparts and hold great promise for novel electronic and optoelectronic applications. Controlled growth of such 2D materials with different thickness, composition, and symmetry are of central importance to realize their potential. In particular, the ability to control the symmetry of TMD layers is highly desirable because breaking the inversion symmetry can lead to intriguing valley physics, nonlinear optical properties, and piezoelectric responses. Here we report the first chemical vapor deposition (CVD) growth of spirals of layered MoS2 with atomically thin helical periodicity, which exhibits a chiral structure and breaks the three-dimensional (3D) inversion symmetry explicitly. The spirals composed of tens of connected MoS2 layers with decreasing areas: each basal plane has a triangular shape and shrinks gradually to the summit when spiraling up. All the layers in the spiral assume an AA lattice stacking, which is in contrast to the centrosymmetric AB stacking in natural MoS2 crystals. We show that the noncentrosymmetric MoS2 spiral leads to a strong bulk second-order optical nonlinearity. In addition, we found that the growth of spirals involves a dislocation mechanism, which can be generally applicable to other 2D TMD materials. PMID:25343743

  16. Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing

    Energy Technology Data Exchange (ETDEWEB)

    Hwang, Yoontae; Dayeh, Shadi A., E-mail: sdayeh@ece.ucsd.edu [Department of Electrical and Computer Engineering, University of California, San Diego, California 92093 (United States); Nguyen, Binh-Minh [Department of Electrical and Computer Engineering, University of California, San Diego, California 92093 (United States); Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

    2013-12-23

    Conformal coating of metal layers on three-dimensional structures is essential for advanced electronic devices such as storage elements, transistors, and sensors. The quality of atomic layer deposited platinum on oxide surfaces was enhanced by adding pre-deposition pulses of trimethylaluminum (TMA) for improved wetting. With an optimal number of TMA pre-pulses, a 6 nm thick Pt film was perfectly coalesced in contrast to only Pt island formation without TMA pre-pulses. A Pt gate all around Ge/Si nanowire field effect transistor was realized highlighting the potential of this approach for efficient deposition of Pt on 3D nanoelectronic devices.

  17. Tribological Properties of Nanometric Atomic Layer Depositions Applied on AISI 420 Stainless Steel

    OpenAIRE

    Marin, E.; Lanzutti, A.; Fedrizzi, L.

    2013-01-01

    Atomic Layer Deposition ( ALD ) is a modern technique that Allows to deposit nanometric, conformal coatings on almost any kind of substrates, from plastics to ceramic, metals or even composites. ALD coatings are not dependent on the morphology of the substrate and are only regulated by the composition of the precursors, the chamber temperature and the number of cycles. In this work, mono- and bi -layer nanometric, protective low-temperature ALD Coatings, based on Al2O3 and TiO2 were applied o...

  18. Large Area Growth and Electrical Properties of p-Type WSe2 Atomic Layers

    OpenAIRE

    Zhou, Hailong; Wang, Chen; Shaw, Jonathan C.; Cheng, Rui; Chen, Yu; Huang, Xiaoqing; Liu, Yuan; Weiss, Nathan O; Lin, Zhaoyang; Huang, Yu; Duan, Xiangfeng

    2014-01-01

    Transition metal dichacogenides represent a unique class of two-dimensional layered materials that can be exfoliated into single or few atomic layers. Tungsten diselenide (WSe2) is one typical example with p-type semiconductor characteristics. Bulk WSe2 has an indirect band gap (∼1.2 eV), which transits into a direct band gap (∼1.65 eV) in monolayers. Monolayer WSe2, therefore, is of considerable interest as a new electronic material for functional electronics and optoelectronics. However, th...

  19. Flat metallic surface gratings with sub-10 nm gaps controlled by atomic-layer deposition

    Science.gov (United States)

    Chen, Borui; Ji, Dengxin; Cheney, Alec; Zhang, Nan; Song, Haomin; Zeng, Xie; Thomay, Tim; Gan, Qiaoqiang; Cartwright, Alexander

    2016-09-01

    Atomic layer lithography is a recently reported new technology to fabricate deep-subwavelength features down to 1–2 nm, based on combinations of electron beam lithography (EBL) and atomic layer deposition (ALD). However, the patterning area is relatively small as limited by EBL, and the fabrication yield is not very high due to technical challenges. Here we report an improved procedure to fabricate flat metallic surfaces with sub-10 nm features based on ALD processes. To demonstrate the scalability of the new manufacturing method, we combine the ALD process with large area optical interference patterning, which is particularly promising for the development of practical applications for nanoelectronics and nanophotonics with extremely strong confinement of electromagnetic fields.

  20. CoFe2/Al2O3/PMNPT multiferroic heterostructures by atomic layer deposition

    Science.gov (United States)

    Zhou, Ziyao; Grocke, Garrett; Yanguas-Gil, Angel; Wang, Xinjun; Gao, Yuan; Sun, Nianxiang; Howe, Brandon; Chen, Xing

    2016-05-01

    Multiferroic materials and applications allow electric bias control of magnetism or magnetic bias control of polarization, enabling fast, compact, energy-efficient devices in RF/microwave communication systems such as filters, shifters, and antennas; electronics devices such as inductors and capacitors; and other magnetic material related applications including sensors and memories. In this manuscript, we utilize atomic layer deposition technology to grow magnetic CoFe metallic thin films onto PMNPT, with a ˜110 Oe electric field induced ferromagnetic resonance field shift in the CoFe/Al2O3/PMNPT multiferroic heterostructure. Our work demonstrates an atomic layer deposition fabricated multiferroic heterostructure with significant tunability and shows that the unique thin film growth mechanism will benefit integrated multiferroic application in near future.

  1. Atomic layer deposition of TiO2 thin films on nanoporous alumina templates: Medical applications

    Science.gov (United States)

    Narayan, Roger J.; Monteiro-Riviere, Nancy A.; Brigmon, Robin L.; Pellin, Michael J.; Elam, Jeffrey W.

    2009-06-01

    Nanostructured materials may play a significant role in controlled release of pharmacologic agents for treatment of cancer. Many nanoporous polymer materials are inadequate for use in drug delivery. Nanoporous alumina provides several advantages over other materials for use in controlled drug delivery and other medical applications. Atomic layer deposition was used to coat all the surfaces of a nanoporous alumina membrane in order to reduce the pore size in a controlled manner. Neither the 20 nm nor the 100 nm TiO2-coated nanoporous alumina membranes exhibited statistically lower viability compared to the uncoated nanoporous alumina membrane control materials. Nanostructured materials prepared using atomic layer deposition may be useful for delivering a pharmacologic agent at a precise rate to a specific location in the body. These materials may serve as the basis for “smart” drug delivery devices, orthopedic implants, or self-sterilizing medical devices.

  2. Evolution of microstructure and related optical properties of ZnO grown by atomic layer deposition

    Directory of Open Access Journals (Sweden)

    Adib Abou Chaaya

    2013-10-01

    Full Text Available A study of transmittance and photoluminescence spectra on the growth of oxygen-rich ultra-thin ZnO films prepared by atomic layer deposition is reported. The structural transition from an amorphous to a polycrystalline state is observed upon increasing the thickness. The unusual behavior of the energy gap with thickness reflected by optical properties is attributed to the improvement of the crystalline structure resulting from a decreasing concentration of point defects at the growth of grains. The spectra of UV and visible photoluminescence emissions correspond to transitions near the band-edge and defect-related transitions. Additional emissions were observed from band-tail states near the edge. A high oxygen ratio and variable optical properties could be attractive for an application of atomic layer deposition (ALD deposited ultrathin ZnO films in optical sensors and biosensors.

  3. Evolution of microstructure and related optical properties of ZnO grown by atomic layer deposition.

    Science.gov (United States)

    Abou Chaaya, Adib; Viter, Roman; Bechelany, Mikhael; Alute, Zanda; Erts, Donats; Zalesskaya, Anastasiya; Kovalevskis, Kristaps; Rouessac, Vincent; Smyntyna, Valentyn; Miele, Philippe

    2013-01-01

    A study of transmittance and photoluminescence spectra on the growth of oxygen-rich ultra-thin ZnO films prepared by atomic layer deposition is reported. The structural transition from an amorphous to a polycrystalline state is observed upon increasing the thickness. The unusual behavior of the energy gap with thickness reflected by optical properties is attributed to the improvement of the crystalline structure resulting from a decreasing concentration of point defects at the growth of grains. The spectra of UV and visible photoluminescence emissions correspond to transitions near the band-edge and defect-related transitions. Additional emissions were observed from band-tail states near the edge. A high oxygen ratio and variable optical properties could be attractive for an application of atomic layer deposition (ALD) deposited ultrathin ZnO films in optical sensors and biosensors.

  4. Effects of growth temperature on high-quality In0.2Ga0.8N layers by plasma-assisted molecular beam epitaxy

    Institute of Scientific and Technical Information of China (English)

    Zhang Dongyan; Zheng Xinhe; Li Xuefei; Wu Yuanyuan; Wang Jianfeng; Yang Hui

    2012-01-01

    High-quality In0.2Ga0.8N epilayers were grown on a GaN template at temperatures of 520 and 580 ℃ via plasma-assisted molecular beam epitaxy.The X-ray rocking curve full widths at half maximum (FWHM) of (10.2)reflections is 936 arcsec for the 50-nm-thick InGaN layers at the lower temperature.When the growth temperature increases to 580 ℃,the FWHM of (00.2) reflections for these samples is very narrow and keeps similar,while significant improvement of(10.2) reflections with an FWHM value of 612 arcsec has been observed.This improved quality in InGaN layers grown at 580 ℃ is also reflected by the much larger size of the crystalline column from the AFM results,stronger emission intensity as well as a decreased FWHM of room temperature PL from 136 to 93.9 meV.

  5. Elaboration by epitaxy in liquid phase and monocrystalline layers of doped Yag. Realisation of wave guides lasers neodymium and ytterbium at low thresholds

    International Nuclear Information System (INIS)

    This thesis reports on the prototype development of a new laser waveguide fabrication technique, Liquid Phase Epitaxy, as part of the research on diode-pumped compact laser devices. This technique has been applied to the growth of single crystal thin layers of neodymium and ytterbium doped YAG on pure YAG substrates. In order to obtain good quality waveguides, we have defined the growth conditions, and demonstrated the advantage of the growth of an undoped YAG cladding layer. Two extra dopings have been studied: gallium, in order to control the refractive index of the layer, and lutetium, in order to control their lattice mismatch. The determination of the segregation coefficient of these four dopants has required the development of a model that takes into account the evolution of the melt with time. We have measured the refractive index increase for each dopant and proposed a mechanism that explains this increase. The spectroscopic characterisation of the layers has shown that the neodymium and ytterbium ions have the same properties as in the bulk material of the same composition. The laser characterisation has shown very low propagation losses (around 0.1 dB/cm), comparable to those of bulk. For the neodymium laser transition at 1064 nm, we have demonstrated the laser effect for an absorbed power threshold of 700μW and measured a slope efficiency of 40% for a threshold of 14 mW in diode pumping. For quasi 3 level transitions, a significant reduction in threshold with respect to unguided lasers has been obtained: at 946 nm in a neodymium doped waveguide, at 1029 nm in an ytterbium doped waveguide, with a 1W diode bar pump. A slope efficiency of 80% has also been measured in an ytterbium doped waveguided emitting at 1048nm

  6. Spectroscopic ellipsometry analysis of GaAs{sub 1-x}N{sub x} layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Ben Sedrine, N. [Laboratoire de Photovoltaique et de Semiconducteurs, Centre de Recherche et de Technologie de l' Energie, BP. 95, Hammam-Lif 2050 (Tunisia)], E-mail: bsnebiha@yahoo.fr; Rihani, J. [Laboratoire de Photovoltaique et de Semiconducteurs, Centre de Recherche et de Technologie de l' Energie, BP. 95, Hammam-Lif 2050 (Tunisia); Stehle, J.L. [SOPRA S.A., 26 rue Pierre Joigneaux 92270 Bois Colombes (France); Harmand, J.C. [Laboratoire de Photonique et de Nanostructures, CNRS Route de Nozay 91 460, Marcoussis (France); Chtourou, R. [Laboratoire de Photovoltaique et de Semiconducteurs, Centre de Recherche et de Technologie de l' Energie, BP. 95, Hammam-Lif 2050 (Tunisia)

    2008-07-01

    In this work, we present the effect of nitrogen incorporation on the dielectric function of GaAsN samples, grown by molecular beam epitaxy (MBE) followed by a rapid thermal annealing (for 90 s at 680 deg. C). The GaAs{sub 1-x}N{sub x} samples with N content up to 1.5% (x = 0.0%, 0.1%, 0.5%, 1.5%), are investigated using room temperature spectroscopic ellipsometry (SE). The optical transitions in the spectral region around 3 eV are analyzed by fitting analytical critical point line shapes to the second derivative of the dielectric function. It was found that the features associated with E{sub 1} and E{sub 1} + {delta}{sub 1} transitions are blue-shifted and become less sharp with increasing nitrogen incorporation, in contrast to the case of E{sub 0} transition energy in GaAs{sub 1-x}N{sub x}. An increase of the split-off {delta}{sub 1} energy with nitrogen content was also obtained, in agreement to results found with MOVPE GaAs{sub 1-x}N{sub x} grown samples.

  7. Atomic layer deposition of copper – study through density functional theory

    OpenAIRE

    Dey, Gangotri

    2014-01-01

    The wonder of the last century has been the rapid development in technology. One of the sectors that it has touched immensely is the electronic industry. There has been exponential development in the field and scientists are pushing new horizons. There is an increased dependence in technology for every individual from different strata in the society. Atomic Layer Deposition (ALD) is a unique technique for growing thin films. It is widely used in the semiconductor industry. Films as thin as fe...

  8. On model materials designed by atomic layer deposition for catalysis purposes

    OpenAIRE

    2011-01-01

    The aim of this work was to investigate the potential of model materials designed by atomic layer deposition toward applications in catalysis research. Molybdenum based catalysts promoted with cobalt were selected as target materials, considering their important roles in various industrial processes. Particular attention was paid to understand the growth dynamics of the ALD processes involved and further to characterize the obtained materials carefully. It was of main concern to verify the fe...

  9. A brief review of atomic layer deposition: from fundamentals to applications

    OpenAIRE

    Johnson, Richard W.; Adam Hultqvist; Bent, Stacey F.

    2014-01-01

    Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting reactions, ALD offers exceptional conformality on high-aspect ratio structures, thickness control at the Angstrom level, and tunable film composition. With these advantages, ALD has emerged as a powerful tool for many industrial and research applications. In this review, we provide a brief introduction to ALD and highlight select applications, ...

  10. Enhanced initial growth of atomic-layer-deposited metal oxides on hydrogen-terminated silicon

    International Nuclear Information System (INIS)

    A route is presented for activation of hydrogen-terminated Si(100) prior to atomic layer deposition. It is based on our discovery from in situ infrared spectroscopy that organometallic precursors can effectively initiate oxide growth. Narrow nuclear resonance profiling and Rutherford backscattering spectrometry show that surface functionalization by pre-exposure to 108 Langmuir trimethylaluminum at 300 deg. C leads to enhanced nucleation and to nearly linear growth kinetics of the high-permittivity gate dielectrics aluminum oxide and hafnium oxide

  11. Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor

    OpenAIRE

    Curtisha D. Travis; Raymond A. Adomaitis

    2013-01-01

    A laboratory-scale atomic layer deposition (ALD) reactor system model is derived for alumina deposition using trimethylaluminum and water as precursors. Model components describing the precursor thermophysical properties, reactor-scale gas-phase dynamics and surface reaction kinetics derived from absolute reaction rate theory are integrated to simulate the complete reactor system. Limit-cycle solutions defining continuous cyclic ALD reactor operation are computed with a fixed point algorithm ...

  12. Indium-Free Fully Transparent Electronics Deposited Entirely by Atomic Layer Deposition.

    Science.gov (United States)

    Nayak, Pradipta K; Wang, Zhenwei; Alshareef, Husam N

    2016-09-01

    Indium-free, fully transparent thin-film transistors are fabricated entirely by the atomic layer deposition technique on rigid and flexible substrates at a low temperature of 160 °C. The transistors show high saturation mobility, large switching ratio, and small subthreshold swing value. The inverters and ring oscillators show large gain value and small propagation delay time, indicating the potential of this process in transparent electronic devices.

  13. Dispersion engineered high-Q silicon Nitride Ring-Resonators via Atomic Layer Deposition

    CERN Document Server

    Riemensberger, Johann; Herr, Tobias; Brasch, Victor; Holzwarth, Ronald; Kippenberg, Tobias J

    2012-01-01

    We demonstrate dispersion engineering of integrated silicon nitride based ring resonators through conformal coating with hafnium dioxide deposited on top of the structures via atomic layer deposition (ALD). Both, magnitude and bandwidth of anomalous dispersion can be significantly increased. All results are confirmed by high resolution frequency-comb-assisted-diode-laser spectroscopy and are in very good agreement with the simulated modification of the mode spectrum.

  14. Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition

    International Nuclear Information System (INIS)

    Crystalline vanadium dioxide (VO2) thin films were prepared by annealing amorphous VO2 films which were deposited by atomic layer deposition on a SiO2 substrate. A large influence of the oxygen partial pressure in the annealing ambient was observed by means of in-situ X-ray diffraction. In the range between 1 and 10 Pa of oxygen the interesting VO2(R) phase crystallized near 450 °C. Between 2 and 10 Pa of oxygen, metastable VO2(B) was observed as an intermediate crystalline phase before it transformed to VO2(R). Anneals in inert gas did not show any crystallization, while oxygen partial pressures above 10 Pa resulted in oxidation into the higher oxide phase V6O13. Film thickness did not have much effect on the crystallization behavior, but thinner films suffered more from agglomeration during the high-temperature crystallization on the SiO2 substrate. Nevertheless, continuous polycrystalline VO2(R) films were obtained with thicknesses down to 11 nm. In the case where VO2(R) was formed, the semiconductor–metal transition was observed by three complementary techniques. This transition near 68 °C was characterized by X-ray diffraction, showing the transformation of the crystal structure, by spectroscopic ellipsometry, mapping optical changes, and by sheet resistance measurements, showing resistance changes larger than 2 orders of magnitude between the low-temperature semiconducting state and the high-temperature metallic state. - Highlights: • Amorphous VO2 films were grown by atomic layer deposition. • Crystallization was studied by means of in-situ X-ray diffraction (XRD). • The optimal oxygen partial pressure during annealing was found to be around 1 Pa. • Continuous crystalline VO2 layers down to 11 nm thickness were obtained at 450 °C. • XRD, ellipsometry and sheet resistance showed the semiconductor–metal transition

  15. Atomic layer deposition on polymer based flexible packaging materials: Growth characteristics and diffusion barrier properties

    Energy Technology Data Exchange (ETDEWEB)

    Kaeaeriaeinen, Tommi O., E-mail: tommi.kaariainen@lut.f [ASTRaL, Lappeenranta University of Technology, Prikaatinkatu 3 E, 50100 Mikkeli (Finland); Maydannik, Philipp, E-mail: philipp.maydannik@lut.f [ASTRaL, Lappeenranta University of Technology, Prikaatinkatu 3 E, 50100 Mikkeli (Finland); Cameron, David C., E-mail: david.cameron@lut.f [ASTRaL, Lappeenranta University of Technology, Prikaatinkatu 3 E, 50100 Mikkeli (Finland); Lahtinen, Kimmo, E-mail: kimmo.lahtinen@tut.f [Tampere University of Technology, Paper Converting and Packaging Technology, P.O. Box 541, 33101 Tampere (Finland); Johansson, Petri, E-mail: petri.johansson@tut.f [Tampere University of Technology, Paper Converting and Packaging Technology, P.O. Box 541, 33101 Tampere (Finland); Kuusipalo, Jurkka, E-mail: jurkka.kuusipalo@tut.f [Tampere University of Technology, Paper Converting and Packaging Technology, P.O. Box 541, 33101 Tampere (Finland)

    2011-03-01

    One of the most promising areas for the industrial application of atomic layer deposition (ALD) is for gas barrier layers on polymers. In this work, a packaging material system with improved diffusion barrier properties has been developed and studied by applying ALD on flexible polymer based packaging materials. Nanometer scale metal oxide films have been applied to polymer-coated papers and their diffusion barrier properties have been studied by means of water vapor and oxygen transmission rates. The materials for the study were constructed in two stages: the paper was firstly extrusion coated with polymer film, which was then followed by the ALD deposition of oxide layer. The polymers used as extrusion coatings were polypropylene, low and high density polyethylene, polylactide and polyethylene terephthalate. Water vapor transmission rates (WVTRs) were measured according to method SCAN-P 22:68 and oxygen transmission rates (O{sub 2}TRs) according to a standard ASTM D 3985. According to the results a 10 nm oxide layer already decreased the oxygen transmission by a factor of 10 compared to uncoated material. WVTR with 40 nm ALD layer was better than the level currently required for most common dry flexible packaging applications. When the oxide layer thickness was increased to 100 nm and above, the measured WVTRs were limited by the measurement set up. Using an ALD layer allowed the polymer thickness on flexible packaging materials to be reduced. Once the ALD layer was 40 nm thick, WVTRs and O{sub 2}TRs were no longer dependent on polymer layer thickness. Thus, nanometer scale ALD oxide layers have shown their feasibility as high quality diffusion barriers on flexible packaging materials.

  16. Enhancing of catalytic properties of vanadia via surface doping with phosphorus using atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Strempel, Verena E.; Naumann d' Alnoncourt, Raoul, E-mail: r.naumann@bascat.tu-berlin.de [BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin (Germany); Löffler, Daniel [Process Research and Chemical Engineering, BASF SE, Carl-Bosch-Straße 38, 67056 Ludwigshafen (Germany); Kröhnert, Jutta; Skorupska, Katarzyna; Johnson, Benjamin [Department of Inorganic Chemistry, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin (Germany); Driess, Matthias [BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin, Germany and Technische Universität Berlin, Institut für Chemie, Sekr. C2, Straße des 17. Juni 135, 10623 Berlin (Germany); Rosowski, Frank [BasCat - UniCat BASF JointLab, Technische Universität Berlin, Sekr. EW K 01, Hardenbergstraße 36, 10623 Berlin, Germany and Process Research and Chemical Engineering, BASF SE, Carl-Bosch-Straße 38, 67056 Ludwigshafen (Germany)

    2016-01-15

    Atomic layer deposition is mainly used to deposit thin films on flat substrates. Here, the authors deposit a submonolayer of phosphorus on V{sub 2}O{sub 5} in the form of catalyst powder. The goal is to prepare a model catalyst related to the vanadyl pyrophosphate catalyst (VO){sub 2}P{sub 2}O{sub 7} industrially used for the oxidation of n-butane to maleic anhydride. The oxidation state of vanadium in vanadyl pyrophosphate is 4+. In literature, it was shown that the surface of vanadyl pyrophosphate contains V{sup 5+} and is enriched in phosphorus under reaction conditions. On account of this, V{sub 2}O{sub 5} with the oxidation state of 5+ for vanadium partially covered with phosphorus can be regarded as a suitable model catalyst. The catalytic performance of the model catalyst prepared via atomic layer deposition was measured and compared to the performance of catalysts prepared via incipient wetness impregnation and the original V{sub 2}O{sub 5} substrate. It could be clearly shown that the dedicated deposition of phosphorus by atomic layer deposition enhances the catalytic performance of V{sub 2}O{sub 5} by suppression of total oxidation reactions, thereby increasing the selectivity to maleic anhydride.

  17. Hexagonal Boron Nitride Tunnel Barriers Grown on Graphite by High Temperature Molecular Beam Epitaxy

    Science.gov (United States)

    Cho, Yong-Jin; Summerfield, Alex; Davies, Andrew; Cheng, Tin S.; Smith, Emily F.; Mellor, Christopher J.; Khlobystov, Andrei N.; Foxon, C. Thomas; Eaves, Laurence; Beton, Peter H.; Novikov, Sergei V.

    2016-01-01

    We demonstrate direct epitaxial growth of high-quality hexagonal boron nitride (hBN) layers on graphite using high-temperature plasma-assisted molecular beam epitaxy. Atomic force microscopy reveals mono- and few-layer island growth, while conducting atomic force microscopy shows that the grown hBN has a resistance which increases exponentially with the number of layers, and has electrical properties comparable to exfoliated hBN. X-ray photoelectron spectroscopy, Raman microscopy and spectroscopic ellipsometry measurements on hBN confirm the formation of sp2-bonded hBN and a band gap of 5.9 ± 0.1 eV with no chemical intermixing with graphite. We also observe hexagonal moiré patterns with a period of 15 nm, consistent with the alignment of the hBN lattice and the graphite substrate. PMID:27681943

  18. Atomic Structure of a Spinel-like Transition Al2O3 (100) Surface

    DEFF Research Database (Denmark)

    Jensen, Thomas Nørregaard; Meinander, Kristoffer; Helveg, Stig;

    2014-01-01

    We study a crystalline epitaxial alumina thin film with the characteristics of a spinel-type transition Al2O3(100) surface by using atom-resolved noncontact atomic force microscopy and density functional theory. It is shown that the films are terminated by an Al-O layer rich in Al vacancies...

  19. Single-Atom Pd₁/Graphene Catalyst Achieved by Atomic Layer Deposition: Remarkable Performance in Selective Hydrogenation of 1,3-Butadiene.

    Science.gov (United States)

    Yan, Huan; Cheng, Hao; Yi, Hong; Lin, Yue; Yao, Tao; Wang, Chunlei; Li, Junjie; Wei, Shiqiang; Lu, Junling

    2015-08-26

    We reported that atomically dispersed Pd on graphene can be fabricated using the atomic layer deposition technique. Aberration-corrected high-angle annular dark-field scanning transmission electron microscopy and X-ray absorption fine structure spectroscopy both confirmed that isolated Pd single atoms dominantly existed on the graphene support. In selective hydrogenation of 1,3-butadiene, the single-atom Pd1/graphene catalyst showed about 100% butenes selectivity at 95% conversion at a mild reaction condition of about 50 °C, which is likely due to the changes of 1,3-butadiene adsorption mode and enhanced steric effect on the isolated Pd atoms. More importantly, excellent durability against deactivation via either aggregation of metal atoms or carbonaceous deposits during a total 100 h of reaction time on stream was achieved. Therefore, the single-atom catalysts may open up more opportunities to optimize the activity, selectivity, and durability in selective hydrogenation reactions. PMID:26268551

  20. Atomic scale imaging of competing polar states in a Ruddlesden-Popper layered oxide

    Science.gov (United States)

    Stone, Greg; Ophus, Colin; Birol, Turan; Ciston, Jim; Lee, Che-Hui; Wang, Ke; Fennie, Craig J.; Schlom, Darrell G.; Alem, Nasim; Gopalan, Venkatraman

    2016-08-01

    Layered complex oxides offer an unusually rich materials platform for emergent phenomena through many built-in design knobs such as varied topologies, chemical ordering schemes and geometric tuning of the structure. A multitude of polar phases are predicted to compete in Ruddlesden-Popper (RP), An+1BnO3n+1, thin films by tuning layer dimension (n) and strain; however, direct atomic-scale evidence for such competing states is currently absent. Using aberration-corrected scanning transmission electron microscopy with sub-Ångstrom resolution in Srn+1TinO3n+1 thin films, we demonstrate the coexistence of antiferroelectric, ferroelectric and new ordered and low-symmetry phases. We also directly image the atomic rumpling of the rock salt layer, a critical feature in RP structures that is responsible for the competing phases; exceptional quantitative agreement between electron microscopy and density functional theory is demonstrated. The study shows that layered topologies can enable multifunctionality through highly competitive phases exhibiting diverse phenomena in a single structure.

  1. Atomic scale imaging of competing polar states in a Ruddlesden–Popper layered oxide

    Science.gov (United States)

    Stone, Greg; Ophus, Colin; Birol, Turan; Ciston, Jim; Lee, Che-Hui; Wang, Ke; Fennie, Craig J.; Schlom, Darrell G.; Alem, Nasim; Gopalan, Venkatraman

    2016-01-01

    Layered complex oxides offer an unusually rich materials platform for emergent phenomena through many built-in design knobs such as varied topologies, chemical ordering schemes and geometric tuning of the structure. A multitude of polar phases are predicted to compete in Ruddlesden–Popper (RP), An+1BnO3n+1, thin films by tuning layer dimension (n) and strain; however, direct atomic-scale evidence for such competing states is currently absent. Using aberration-corrected scanning transmission electron microscopy with sub-Ångstrom resolution in Srn+1TinO3n+1 thin films, we demonstrate the coexistence of antiferroelectric, ferroelectric and new ordered and low-symmetry phases. We also directly image the atomic rumpling of the rock salt layer, a critical feature in RP structures that is responsible for the competing phases; exceptional quantitative agreement between electron microscopy and density functional theory is demonstrated. The study shows that layered topologies can enable multifunctionality through highly competitive phases exhibiting diverse phenomena in a single structure. PMID:27578622

  2. Atomic scale imaging of competing polar states in a Ruddlesden-Popper layered oxide.

    Science.gov (United States)

    Stone, Greg; Ophus, Colin; Birol, Turan; Ciston, Jim; Lee, Che-Hui; Wang, Ke; Fennie, Craig J; Schlom, Darrell G; Alem, Nasim; Gopalan, Venkatraman

    2016-01-01

    Layered complex oxides offer an unusually rich materials platform for emergent phenomena through many built-in design knobs such as varied topologies, chemical ordering schemes and geometric tuning of the structure. A multitude of polar phases are predicted to compete in Ruddlesden-Popper (RP), An+1BnO3n+1, thin films by tuning layer dimension (n) and strain; however, direct atomic-scale evidence for such competing states is currently absent. Using aberration-corrected scanning transmission electron microscopy with sub-Ångstrom resolution in Srn+1TinO3n+1 thin films, we demonstrate the coexistence of antiferroelectric, ferroelectric and new ordered and low-symmetry phases. We also directly image the atomic rumpling of the rock salt layer, a critical feature in RP structures that is responsible for the competing phases; exceptional quantitative agreement between electron microscopy and density functional theory is demonstrated. The study shows that layered topologies can enable multifunctionality through highly competitive phases exhibiting diverse phenomena in a single structure. PMID:27578622

  3. Atomic layer deposition enhanced grafting of phosphorylcholine on stainless steel for intravascular stents.

    Science.gov (United States)

    Zhong, Qi; Yan, Jin; Qian, Xu; Zhang, Tao; Zhang, Zhuo; Li, Aidong

    2014-09-01

    In-stent restenosis (ISR) and re-endothelialization delay are two major issues of intravascular stent in terms of clinical safety and effects. Construction of mimetic cell membrane surface on stents using phosphorylcholine have been regarded as one of the most powerful strategies to resolve these two issues and improve the performance of stents. In this study, atomic layer deposition (ALD) technology, which is widely used in semiconductor industry, was utilized to fabricate ultra-thin layer (10nm) of alumina (Al2O3) on 316L stainless steel (SS), then the alumina covered surface was modified with 3-aminopropyltriethoxysilane (APS) and 2-methacryloyloxyethyl phosphorylcholine (MPC) sequentially in order to produce phosphorylcholine mimetic cell membrane surface. The pristine and modified surfaces were characterized using X-ray photoelectron spectroscopy, atomic force microscope and water contact angle measurement. Furthermore, the abilities of protein adsorption, platelet adhesion and cell proliferation on the surfaces were investigated. It was found that alumina layer can significantly enhance the surface grafting of APS and MPC on SS; and in turn efficiently inhibit protein adsorption and platelet adhesion, and promote the attachment and proliferation of human umbilical vein endothelial cells (HUVEC) on the surfaces. In association with the fact that the deposition of alumina layer is also beneficial to the improvement of adhesion and integrity of drug-carrying polymer coating on drug eluting stents, we expect that ALD technology can largely assist in the modifications on inert metallic surfaces and benefit implantable medical devices, especially intravascular stents.

  4. Heating rate and spin flip lifetime due to near field noise in layered superconducting atom chips

    CERN Document Server

    Fermani, Rachele; Zhang, Bo; Lim, Michael J; Dumke, Rainer

    2009-01-01

    We theoretically investigate the heating rate and spin flip lifetimes due to near field noise for atoms trapped close to layered superconducting structures. In particular, we compare the case of a gold layer deposited above a superconductor with the case of a bare superconductor. We study a niobium-based and a YBCO-based chip. For both niobium and YBCO chips at a temperature of 4.2 K, we find that the deposition of the gold layer can have a significant impact on the heating rate and spin flip lifetime, as a result of the increase of the near field noise. At a chip temperature of 77 K, this effect is less pronounced for the YBCO chip.

  5. Fabrication and atomic structure of size-selected, layered MoS2 clusters for catalysis.

    Science.gov (United States)

    Cuddy, Martin J; Arkill, Kenton P; Wang, Zhi Wei; Komsa, Hannu-Pekka; Krasheninnikov, Arkady V; Palmer, Richard E

    2014-11-01

    Well defined MoS2 nanoparticles having a layered structure and abundant edges would be of considerable interest for applications including photocatalysis. We report the atomic structure of MoS2 size-selected clusters with mass in a range all the way from 50 to ∼2000 MoS2 units. The clusters were prepared by magnetron sputtering and gas condensation prior to size selection and soft landing on carbon supports. Aberration-corrected scanning transmission electron microscopy (STEM) in high-angle annular dark-field (HAADF) mode reveals a layered structure and Mo-Mo spacing similar to the bulk material. The mean number of layers in these lamellar clusters increases from one to three with increasing mass, consistent with density functional theory calculations of the balance between edge energies and interlayer binding. PMID:25226541

  6. Graphene Coatings: Probing the Limits of the One Atom Thick Protection Layer

    DEFF Research Database (Denmark)

    Nilsson, Louis; Andersen, Mie; Balog, Richard;

    2012-01-01

    The limitations of graphene as an effective corrosion-inhibiting coating on metal surfaces, here exemplified by the hex-reconstructed Pt(100) surface, are probed by scanning tunneling microscopy measurements and density functional theory calculations. While exposure of small molecules directly onto...... the Pt(100) surface will lift the reconstruction, a single graphene layer is observed to act as an effective coating, protecting the reactive surface from O2 exposure and thus preserving the reconstruction underneath the graphene layer in O2 pressures as high as 104 mbar. A similar protective effect...... against CO is observed at CO pressures below 106 mbar. However, at higher pressures CO is observed to intercalate under the graphene coating layer, thus lifting the reconstruction. The limitations of the coating effect are further tested by exposure to hot atomic hydrogen. While the coating can withstand...

  7. Controlled growth of rutile TiO{sub 2} by atomic layer deposition on oxidized ruthenium

    Energy Technology Data Exchange (ETDEWEB)

    Popovici, Mihaela; Swerts, Johan; Tomida, Kazuyuki; Radisic, Dunja; Kim, Min-Soo; Kaczer, Ben; Richard, Olivier; Bender, Hugo; Delabie, Annelies; Moussa, Alain; Vrancken, Christa; Opsomer, Karl; Franquet, Alexis; Pawlak, Malgorzata A.; Schaekers, Marc; Altimime, Laith; Elshocht, Sven van; Kittl, Jorge A. [Imec, Kapeldreef 75, 3001, Leuven (Belgium)

    2011-01-15

    Crystalline rutile TiO{sub 2} films were grown by atomic layer deposition on oxidized Ru electrodes using a titanium methoxide as the metal precursor and O{sub 3} as the oxidant. A protective layer of {proportional_to}0.3 nm TiO{sub 2} grown with H{sub 2}O as the oxidant was first deposited in order to avoid etching of the Ru bottom electrode by the O{sub 3} used for the growth of the TiO{sub 2} (bulk) layer. Electrical evaluation of the capacitor stacks with TiO{sub 2} as dielectric, RuO{sub 2}/Ru and Pt as the bottom and top electrodes respectively, resulted in superior characteristics of the rutile phase as compared to the anatase. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  8. Hetero epitaxial graphene on various substrates

    Science.gov (United States)

    Harris, Gary; Kaut, Gurpreet; Taylor, Crawford

    2015-03-01

    Large-scale production of graphene is pivotal for the development of graphene-based electronics. These results focus on the synthesis and characterization of graphene layers. Two methods were used to grow graphene films. First, graphene films were epitaxially grown on silicon carbide substrates by thermal decomposition of SiC at high temperature and low pressure. In-house built reactor consisting of induction furnace was used to form epitaxial films for electronic applications. Second, chemical vapor deposition method was used for direct graphene synthesis on 3C-SiC with the use of copper as a catalyst. In thermal CVD process, hydrogen and methane gases were used as precursors. Methane acts as a carbon source and annealing and cooling were done hydrogen environment. Different polytypes of silicon carbide (6H-SiC and 3C-SiC) and their crystal orientations were exploited as substrates to form epitaxial graphene. Hetero epitaxial 3C-SiC epilayer was first deposited on Si substrate using chemical vapor deposition technique in cold wall, low pressure, and horizontal CVD reactor. The reactor temperature, argon pressure, flow rates and concentration of different gases (propane, silane, hydrogen and argon) was investigated to control the growth of 3C-SiC and silicon sublimation rate. The resulting graphene films were confirmed using Raman spectroscopy. Further, graphene films have been characterized with the tools of atomic force microscopy (AFM) and scanning electron microscopy (SEM). Mobility, electrical resistivity and carrier density measurements were taken using hall measurements. NSF_PRDM

  9. Interface Engineering for Atomic Layer Deposited Alumina Gate Dielectric on SiGe Substrates.

    Science.gov (United States)

    Zhang, Liangliang; Guo, Yuzheng; Hassan, Vinayak Vishwanath; Tang, Kechao; Foad, Majeed A; Woicik, Joseph C; Pianetta, Piero; Robertson, John; McIntyre, Paul C

    2016-07-27

    Optimization of the interface between high-k dielectrics and SiGe substrates is a challenging topic due to the complexity arising from the coexistence of Si and Ge interfacial oxides. Defective high-k/SiGe interfaces limit future applications of SiGe as a channel material for electronic devices. In this paper, we identify the surface layer structure of as-received SiGe and Al2O3/SiGe structures based on soft and hard X-ray photoelectron spectroscopy. As-received SiGe substrates have native SiOx/GeOx surface layers, where the GeOx-rich layer is beneath a SiOx-rich surface. Silicon oxide regrows on the SiGe surface during Al2O3 atomic layer deposition, and both SiOx and GeOx regrow during forming gas anneal in the presence of a Pt gate metal. The resulting mixed SiOx-GeOx interface layer causes large interface trap densities (Dit) due to distorted Ge-O bonds across the interface. In contrast, we observe that oxygen-scavenging Al top gates decompose the underlying SiOx/GeOx, in a selective fashion, leaving an ultrathin SiOx interfacial layer that exhibits dramatically reduced Dit. PMID:27345195

  10. Large-Area Quality Control of Atomically-Thin Layered Materials

    Science.gov (United States)

    Nolen, Craig Merten

    Fast progress in chemical vapor deposition of graphene and other quasi-two-dimensional layered materials such as topological insulators call for development of a reliable high-throughput method of layered materials identification and quality control. The number of atomic planes in graphene or other ultra-thin films has to be determined very fast and over large wafer-scale areas. The previously existed methods of accurate counting of the number of atomic planes in few-layer graphene were primarily based on micro-Raman spectroscopy. These methods were local, slow, and could not be scaled up to characterize the whole wafers. In this dissertation research I proposed and developed an automatic approach for graphene inspection over the wafer-size areas. The proposed method can be scaled up for industrial use. It is based on the image processing analysis of the pseudo-color contrasts uniquely assigned to each few-layer graphene region characterized by a specific number of atomic planes. The initial calibration of the technique is performed with the help of micro-Raman spectroscopy. The image processing is also used to account for the lighting non-uniformity of the samples. Implementation of the technique developed in this dissertation research reduces the cost and time required for graphene identification and quality assessment, and can become the next major impetus for practical applications of graphene, few-layer graphene and other atomically-thin films. The technique was tested on mechanically exfoliated graphene and then extended to the chemical-vapor-deposited graphene, and to bismuth telluride topological insulator thin films. The second part of the dissertation research deals with development of the electrostatic transfer process. The investigated approach allows one to transfer the patterned few-layer graphene films controllably to Si3N4 substrates compatible with other materials. The large-area quality control and graphene transfer techniques developed in this

  11. Structural properties of GaN grown on AlGaN/AlN stress mitigating layers on 100-mm Si (111) by ammonia molecular beam epitaxy

    International Nuclear Information System (INIS)

    The structural properties of GaN grown on AlGaN/AlN stress mitigating layers on 100-mm diameter Si (111) substrate by ammonia molecular beam epitaxy have been reported. High resolution X-ray diffraction, micro-Raman spectroscopy, transmission electron microscopy and secondary ion mass spectroscopy have been used to study the influence of AlN thickness and AlGaN growth temperature on the quality of GaN. GaN grown on thicker AlN showed reduced dislocation density and lesser tensile strain. Three-dimensional growth regime was observed for GaN grown at lower AlGaN growth temperature while higher AlGaN growth temperature resulted in two-dimensional growth mode. The dislocation bending and looping at the AlGaN/AlN interface was found to have significant influence on the dislocation density and strain in the GaN layer. The evolution and interaction of threading dislocations play a major role in determining the quality and the strain states of GaN. - Highlights: ► Structural properties of GaN grown on AlGaN/AlN stress mitigating layers ► Effect of AlN thickness and AlGaN growth temperature on the quality of GaN ► Thicker AlN shows reduced dislocation density and lesser tensile strain. ► Dislocations at the AlGaN/AlN interface influences the residual strain in GaN. ► Si diffusion through pipe diffusion mechanism

  12. Structural properties of GaN grown on AlGaN/AlN stress mitigating layers on 100-mm Si (111) by ammonia molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Agrawal, M., E-mail: manv0002@e.ntu.edu.sg [NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 (Singapore); Dharmarasu, N. [Temasek Laboratories, Nanyang Technological University, 637553 (Singapore); Radhakrishnan, K. [NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 (Singapore); Temasek Laboratories, Nanyang Technological University, 637553 (Singapore); Ravikiran, L. [NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 (Singapore)

    2012-10-01

    The structural properties of GaN grown on AlGaN/AlN stress mitigating layers on 100-mm diameter Si (111) substrate by ammonia molecular beam epitaxy have been reported. High resolution X-ray diffraction, micro-Raman spectroscopy, transmission electron microscopy and secondary ion mass spectroscopy have been used to study the influence of AlN thickness and AlGaN growth temperature on the quality of GaN. GaN grown on thicker AlN showed reduced dislocation density and lesser tensile strain. Three-dimensional growth regime was observed for GaN grown at lower AlGaN growth temperature while higher AlGaN growth temperature resulted in two-dimensional growth mode. The dislocation bending and looping at the AlGaN/AlN interface was found to have significant influence on the dislocation density and strain in the GaN layer. The evolution and interaction of threading dislocations play a major role in determining the quality and the strain states of GaN. - Highlights: Black-Right-Pointing-Pointer Structural properties of GaN grown on AlGaN/AlN stress mitigating layers Black-Right-Pointing-Pointer Effect of AlN thickness and AlGaN growth temperature on the quality of GaN Black-Right-Pointing-Pointer Thicker AlN shows reduced dislocation density and lesser tensile strain. Black-Right-Pointing-Pointer Dislocations at the AlGaN/AlN interface influences the residual strain in GaN. Black-Right-Pointing-Pointer Si diffusion through pipe diffusion mechanism.

  13. Epitaxial growth of ultrathin MgO layers on Fe3O4(0 0 1) films

    Science.gov (United States)

    Nordmann, T.; Kuschel, O.; Wollschläger, J.

    2016-09-01

    The initial growth stages of MgO on Fe3O4 films are studied by means of X-ray photoelectron spectroscopy and low energy electron diffraction to clarify stoichiometric and structural properties of these layered structures. This bilayer structure is important to fabricate high quality magnetic tunnel junctions based on Fe3O4 electrodes and MgO tunneling barriers. For this purpose, the deposition temperature of MgO has been varied between 100 °C and 250 °C. Initially, MgO grows layer-by-layer on Fe3O4/MgO(0 0 1) forming a wetting layer. Depending on the growth temperature, after growth of a 2-3 nm thick laminar wetting layer, the MgO films finally start to roughen during growth. Thus the growth of MgO on Fe3O4/MgO(0 0 1) is described by a Stranski-Krastanov growth mode. Diffraction experiments show that the magnetite (√{ 2} ×√{ 2})R45° superstructure is removed already during the initial stages of MgO deposition. Furthermore, these experiments show that MgO films are rougher for growth at low deposition temperatures.

  14. Atomic and electronic structure of ultrathin fluoride barrier layers at the oxide/Si interface

    Energy Technology Data Exchange (ETDEWEB)

    Pasquali, L; Montecchi, M; Nannarone, S [Department of Materials and Environmental Engineering, University of Modena and Reggio Emilia, Via Vignolese 905, I-41125 Modena (Italy); Boscherini, F [Department of Physics, University of Bologna, Viale Berti Pichat 6/2, I-40127 Bologna (Italy)

    2011-09-07

    A SrF{sub 2} ultrathin barrier layer on Si(001) is used to form a sharp interface and block reactivity and intermixing between the semiconductor and a Yb{sub 2}O{sub 3} overlayer. Yb{sub 2}O{sub 3}/Si(001) and Yb{sub 2}O{sub 3}/SrF{sub 2}/Si(001) interfaces grown in ultra high vacuum by molecular beam epitaxy are studied by photoemission and x-ray absorption fine structure. Without the fluoride interlayer, Yb{sub 2}O{sub 3}/Si(001) presents an interface reacted region formed by SiO{sub x} and/or silicate compounds, which is about 9 A thick and increases up to 14-15 A after annealing at 500-700 {sup 0}C. A uniform single layer of SrF{sub 2} molecules blocks intermixing and reduces the oxidized Si region to 2.4 A after deposition and to 3.5 A after annealing at 500 {sup 0}C. In both cases we estimate a conduction band offset and a valence band offset of {approx} 1.7 eV and 2.4 eV between the oxide and Si, respectively. X-ray absorption fine structure measurements at the Yb L{sub III} edge suggest that the Yb oxide films exhibit a significant degree of static disorder with and without the fluoride barrier. Sr K edge measurements indicate that the ultrathin fluoride films are reacted, with the formation of bonds between Si and Sr; the Sr-Sr and Sr-F interatomic distances in the ultrathin fluoride barrier film are relaxed to the bulk value.

  15. Adsorption studies at ionized surface layers by means of hot atoms

    International Nuclear Information System (INIS)

    Adsorption of ions at the surface of solutions of ionic surface-active substances can directly be studied using hot atoms. Extremely small amounts of suitable radioactive ions, or ions liable to undergo induced nuclear transformations in situ, are added to such solutions, replacing some of the normal counter ions coadsorbed at the primary-adsorbed organic ions. Hot atoms with energies from about 100 keV down to a few electron volts give ranges in water from about 1000 A down to monomoleeular layers. This makes them suitable for sensitive surface layer studies. The hot atoms ejected from the surface are collected and counted. Among α-disintegration recoils, the system Bi212/Tl208 has proved to be suitable. Now, by refining the method, valuable information about adsorption conditions at sodium dodecyl sulphate surface layers could be found. The kinetics of adsorption was studied by following in time the collected recoil activity caused by Bi-ion adsorption. Adsorption isotherms of Bi-ions as a function of the bulk concentration of the surface-active substance under varying conditions of ionic strength, pH and Bi212 activity were measured. By comparing these isotherms with those obtained by measuring the surface tension of the solutions and calculating the surface excess with the aid of a suitably modified Gibbs' isotherm, the adsorption of Bi+++ and Pb++ relative to that of Na+ and H3O+, and by this the extent of ion exchange in the adsorbed layer could be determined. As the method measures the adsorption of charged species, surface reactions transforming primary-adsorbed organic anions to a non-ionic state could be followed. Conclusions could be drawn about the formation of a non-ionized acid soap in the surface and about micelle formation in the bulk under various experimental conditions. (author)

  16. Structural analysis of an epitaxial layer of CdTe on GaAs by the multidirectional channeling technique

    Energy Technology Data Exchange (ETDEWEB)

    Wielunski, L.S. (CSIRO Div. of Applied Physics, Lucas Heights Research Labs., Menai, NSW (Australia)); Kwietniak, M.S.; Pain, G.N. (Telecom Australia Research Labs., Clayton, Victoria (Australia)); Rossouw, C.J. (CSIRO Div. of Materials Science and Tech., Clayton, Victoria (Australia))

    1990-01-01

    Multidirectional RBS channeling analysis is used to identify the crystal orientation of a MOCVD-grown CdTe layer on a (100) GaAs substrate. Results show that the CdTe has a (111) orientation. However, from channeling in different axial directions and a rotational angular scan around the <111> axis, it is deduced that the CdTe layer is multiply twinned about this axis. Cross-sectional electron microscopy has revealed the twins to be 180deg rotational twins. (orig.).

  17. Atmospheric spatial atomic layer deposition of Zn(O,S) buffer layer for Cu(In,Ga)Se2 solar cells

    NARCIS (Netherlands)

    Frijters, C.H.; Poodt, P.; Illeberi, A.

    2016-01-01

    Zinc oxysulfide has been grown by spatial atomic layer deposition (S-ALD) and successfully applied as buffer layer in Cu(In, Ga)Se2 (CIGS) solar cells. S-ALD combines high deposition rates (up to nm/s) with the advantages of conventional ALD, i.e. excellent control of film composition and superior u

  18. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    S. S. Kushvaha

    2014-02-01

    Full Text Available We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001 substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 108 cm−2 at 750 °C than that of the low temperature grown sample (1.1 × 109 cm−2 at 730 °C. A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  19. Selective etching and TEM study of inversion domains in Mg-doped GaN epitaxial layers

    NARCIS (Netherlands)

    Kamler, G.; Borysiuk, J.; Weyher, J.L.; Czernecki, R.; Leszczynski, M.; Grzegory, I.; Porowski, S.

    2005-01-01

    Two different etching techniques were used for the investigation of polarity inversion in the magnesium-doped MOVPE GaN layers deposited on GaN pressure grown substrates. Etching in KOH solution at 100 degrees C and in molten bases at 450 degrees C allowed us to determine precisely the regions of di

  20. Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition

    International Nuclear Information System (INIS)

    A broad and expanding range of materials can be produced by atomic layer deposition at relatively low temperatures, including both oxides and metals. For many applications of interest, however, it is desirable to grow more tailored and complex materials such as semiconductors with a certain doping, mixed oxides, and metallic alloys. How well such mixed materials can be accomplished with atomic layer deposition requires knowledge of the conditions under which the resulting films will be mixed, solid solutions, or laminated. The growth and lamination of zinc oxide and tin oxide is studied here by means of the extremely surface sensitive technique of low energy ion scattering, combined with bulk composition and thickness determination, and x-ray diffraction. At the low temperatures used for deposition (150 °C), there is little evidence for atomic scale mixing even with the smallest possible bilayer period, and instead a morphology with small ZnO inclusions in a SnOx matrix is deduced. Postannealing of such laminates above 400 °C however produces a stable surface phase with a 30% increased density. From the surface stoichiometry, this is likely the inverted spinel of zinc stannate, Zn2SnO4. Annealing to 800 °C results in films containing crystalline Zn2SnO4, or multilayered films of crystalline ZnO, Zn2SnO4, and SnO2 phases, depending on the bilayer period