WorldWideScience

Sample records for amorphous silicon pixel

  1. Amorphous silicon pixel layers with cesium iodide converters for medical radiography

    International Nuclear Information System (INIS)

    The authors describe the properties of evaporated layers of Cesium Iodide (Thallium activated) deposited on substrates that enable easy coupling to amorphous silicon pixel arrays. The CsI (T1) layers range in thickness from 65 to 220μm. The authors used the two-boat evaporator system to deposit CsI(T1) layers. This system ensures the formation of the scintillator film with homogeneous thallium concentration which is essential for optimizing the scintillation light emission efficiency. The Tl concentration was kept to 0.1--0.2 mole percent for the highest light output. Temperature annealing can affect the microstructure as well as light output of the CsI(T1) film. 200--300 C temperature annealing can increase the light output by a factor of two. The amorphous silicon pixel arrays are p-i-n diodes approximately 1μm thick with transparent electrodes to enable them to detect the scintillation light produced by X-rays incident on the CsI(T1). Digital radiography requires a good spatial resolution. This is accomplished by making the detector pixel size less than 50 μm. The light emission from the CsI(T1) is collimated by techniques involving the deposition process on patterned substrates. The authors have measured MTF of greater than 12 line pairs per mm at the 10% level

  2. Amorphous silicon pixel layers with cesium iodide converters for medical radiography

    International Nuclear Information System (INIS)

    We describe the properties of evaporated layers of Cesium Iodide (Thallium activated) deposited on substrates that enable easy coupling to amorphous silicon pixel arrays. The CsI(Tl) layers range in thickness from 65 to 220μm. We used the two-boat evaporator system to deposit CsI(Tl) layers. This system ensures the formation of the scintillator film with homogenous thallium concentration which is essential for optimizing the scintillation light emission efficiency. The Tl concentration was kept to 0.1--0.2 mole percent for the highest light output. Temperature annealing can affect the microstructure as well as light output of the CsI(Tl) film. 200--300C temperature annealing can increase the light output by a factor of two. The amorphous silicon pixel arrays are p-i-n diodes approximately lμm thick with transparent electrodes to enable them to detect the scintillation light produced by X-rays incident on the CsI(Tl). Digital radiography requires a good spatial resolution. This is accomplished by making the detector pixel size less then 50μm. The light emission from the CsI(Tl) is collimated by techniques involving the deposition process on pattered substrates. We have measured MTF of greater than 12 line pairs per mm at the 10% level

  3. High performance uncooled amorphous silicon VGA IRFPA with 17-µm pixel-pitch

    Science.gov (United States)

    Tissot, J. L.; Durand, A.; Garret, Th.; Minassian, C.; Robert, P.; Tinnes, S.; Vilain, M.

    2010-04-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon enables ULIS to develop VGA IRFPA formats with 17μm pixel-pitch to build up the currently available product catalog. This detector keeps all the innovations developed on the 25 μm pixel-pitch ROIC (detector configuration by serial link, low power consumption and wide electrical dynamic range). The specific appeal of this unit lies in the high spatial resolution it provides. The reduction of the pixel-pitch turns this TEC-less VGA array into a product well adapted for high resolution and compact systems. In the last part of the paper, we will look more closely at the high electro-optical performances of this IRFPA and the rapid performance enhancement. We will insist on NETD trade-off with wide thermal dynamic range, as well as the high characteristics uniformity, achieved thanks to the mastering of the amorphous silicon technology coupled with the ROIC design. This technology node paves the way to high end products as well as low end compact smaller formats like 160 x 120 or smaller.

  4. High-Sensitivity X-ray Polarimetry with Amorphous Silicon Active-Matrix Pixel Proportional Counters

    Science.gov (United States)

    Black, J. K.; Deines-Jones, P.; Jahoda, K.; Ready, S. E.; Street, R. A.

    2003-01-01

    Photoelectric X-ray polarimeters based on pixel micropattern gas detectors (MPGDs) offer order-of-magnitude improvement in sensitivity over more traditional techniques based on X-ray scattering. This new technique places some of the most interesting astronomical observations within reach of even a small, dedicated mission. The most sensitive instrument would be a photoelectric polarimeter at the focus of 2 a very large mirror, such as the planned XEUS. Our efforts are focused on a smaller pathfinder mission, which would achieve its greatest sensitivity with large-area, low-background, collimated polarimeters. We have recently demonstrated a MPGD polarimeter using amorphous silicon thin-film transistor (TFT) readout suitable for the focal plane of an X-ray telescope. All the technologies used in the demonstration polarimeter are scalable to the areas required for a high-sensitivity collimated polarimeter. Leywords: X-ray polarimetry, particle tracking, proportional counter, GEM, pixel readout

  5. Photon counting pixel and array in amorphous silicon technology for large area digital medical imaging applications

    Science.gov (United States)

    Yazdandoost, Mohammad Y.; Shin, Kyung W.; Safavian, Nader; Taghibakhsh, Farhad; Karim, Karim S.

    2010-04-01

    A single photon counting Voltage Controlled Oscillator (VCO) based pixel architecture in amorphous silicon (a-Si) technology is reported for large area digital medical imaging. The VCO converts X-ray generated input charge into an output oscillating frequency signal. Experimental results for an in-house fabricated VCO circuit in a-Si technology are presented and external readout circuits to extract the image information from the VCO's frequency output are discussed. These readout circuits can be optimized to reduce the fixed pattern noise and fringing effects in an imaging array containing many such VCO pixels. Noise estimations, stability simulations and measurements for the fabricated VCO are presented. The reported architecture is particularly promising for large area photon counting applications (e.g. low dose fluoroscopy, dental computed tomography (CT)) due to its very low input referred electronic noise, high sensitivity and ease of fabrication in low cost a-Si technology.

  6. Integration of an amorphous silicon passive pixel sensor array with a lateral amorphous selenium detector for large area indirect conversion x-ray imaging applications

    Science.gov (United States)

    Wang, Kai; Yazdandoost, Mohammad Y.; Keshavarzi, Rasoul; Shin, Kyung-Wook; Hristovski, Christos; Abbaszadeh, Shiva; Chen, Feng; Majid, Shaikh Hasibul; Karim, Karim S.

    2011-03-01

    Previously, we reported on a single-pixel detector based on a lateral a-Se metal-semiconductor-metal structure, intended for indirect conversion X-ray imaging. This work is the continuous effort leading to the first prototype of an indirect conversion X-ray imaging sensor array utilizing lateral amorphous selenium. To replace a structurally-sophisticated vertical multilayer amorphous silicon photodiode, a lateral a-Se MSM photodetector is employed which can be easily integrated with an amorphous silicon thin film transistor passive pixel sensor array. In this work, both 2×2 macro-pixel and 32×32 micro-pixel arrays were fabricated and tested along with discussion of the results.

  7. Uncooled amorphous silicon XGA IRFPA with 17μm pixel-pitch for high end applications

    Science.gov (United States)

    Fieque, B.; Robert, P.; Minassian, C.; Vilain, M.; Tissot, J. L.; Crastes, A.; Legras, O.; Yon, J. J.

    2008-04-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon enables ULIS to develop 1024 x 768 (XGA) IRFPAs with 17 μm pixel-pitch to build up the currently available product catalog. This detector has kept all the innovations developed on the full TV format Read Out Integrated Circuit (ROIC) (detector configuration by serial link, two video outputs, low power consumption and wide electrical dynamic range ...). The specific appeal of this unit lies in the high image resolution it provides. The reduction of the pixel-pitch turns this XGA array into a product well adapted for high resolution and compact systems. In the last part of the paper, we will look more closely at high electro-optical performances of this IRFPA; we will highlight the wide thermal dynamic range as well as the high characteristics uniformity and high pixel operability achieved thanks to the mastering of the amorphous silicon technology coupled with the ROIC design.

  8. High-performance uncooled amorphous silicon TEC less XGA IRFPA with 17μm pixel-pitch

    Science.gov (United States)

    Trouilleau, C.; Fièque, B.; Noblet, S.; Giner, F.; Pochic, D.; Durand, A.; Robert, P.; Cortial, S.; Vilain, M.; Tissot, J. L.; Yon, J. J.

    2009-05-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon enables ULIS to develop 1024 x 768 (XGA) IRFPA formats with 17μm pixel-pitch to address high end, high performance applications. This detector has kept all the innovations developed on the full TV format readout integrated circuit (ROIC): detector configuration by serial link, two video outputs, low power consumption, wide electrical dynamic range... The specific appeal of this unit lies in the high image resolution it provides. The reduction of the pixel-pitch turns this XGA array into a product well adapted for high resolution yet compact systems. In the last part of the paper, we will look more closely at the high electro-optical performances of this IRFPA and the rapid performance enhancement. We will insist on NETD coupled with wide thermal dynamic range, as well as the outstanding uniformity and high pixel operability, achieved thanks to the mastering of the amorphous silicon technology coupled with the ROIC design. This technology node paves the way to high end VGA or 1/4VGA sensors as well as large diffusion compact smaller formats like 160 x 120 or smaller.

  9. Uncooled amorphous silicon 160 x 120 IRFPA with 25 μm pixel-pitch for large volume applications

    Science.gov (United States)

    Vilain, M.; Tissot, J. L.; Legras, O.; Yon, J. J.; Minassian, C.; Fièque, B.; Chiappa, J. M.

    2008-03-01

    This paper reviews the specifications and performances of a 160 × 120 uncooled infrared focal plane array made from amorphous silicon microbolometers with a pixel-pitch of 25 μm, integrated into a LCC TEC-less package. This detector has been specifically designed for large volume production, while keeping the main features of high end developments, at detection pixel level, as well as at ROIC level, like detector configuration by serial link in order to minimize the number of electrical inputs, low power, large dynamic range...) The main particular features of this achievement are the miniaturized very low weight package, along with easy TEC-less operation naturally afforded via the readout architecture, which leads to very low consumption levels, making it well adapted to low end hand held or helmet mounted thermal imaging cameras. We present in the last part of this paper the main electro-optical characteristics and TEC-less operation, demonstrating wide thermal dynamic range and low power, thanks to the simple single-level amorphous silicon technology, coupled with advanced ROIC design.

  10. Compact uncooled amorphous silicon 160x120 IRFPA with 25 μm pixel-pitch for large volume applications

    Science.gov (United States)

    Tissot, J. L.; Legras, O.; Minassian, C.; Robert, P.; Fieque, B.; Tinnes, S.; Dupont, B.; Yon, J. J.; Arnaud, A.

    2007-10-01

    This paper reviews specifications and performances of a 160 x 120 uncooled infrared focal plane array made from amorphous silicon micro bolometer with a pixel-pitch of 25 μm, integrated in a LCC package. This detector has been specifically designed for being produced in large volume. The detector has kept all the innovations developed on the full TV format ROIC (detector configuration by serial link, low power consumption or wide electrical dynamic range... ) and offers an advanced TEC-less focal plane array well adapted to low end thermal imaging cameras. The specific appeal of this unit lies in the miniaturization of the packaging and its extremely light weight.In the last part of the paper, we will look more closely at electro-optical performances of this TEC-less product 160 x 120 as well as the other 25 μm products like the 384 x 288. We will insist on the wide thermal dynamic range and the low consumption achieved thanks to the mastering of the amorphous silicon technology coupled with the innovation in the ROIC design.

  11. High-performance uncooled amorphous silicon VGA and XGA IRFPA with 17μm pixel-pitch

    Science.gov (United States)

    Tissot, J. L.; Tinnes, S.; Durand, A.; Minassian, C.; Robert, P.; Vilain, M.

    2010-10-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon with 45μm, 35μm and 25μm, enables ULIS to develop VGA and XGA IRFPA formats with 17μm pixel-pitch to fulfill every applications. These detector keeps all the recent innovations developed on the 25μm pixel-pitch ROIC (detector configuration by serial link, low power consumption and wide electrical dynamic range). The specific appeal of these units lies in the high spatial resolution it provides while keeping the small thermal time constant. The reduction of the pixel-pitch turns the TEC-less VGA array into a product well adapted for high resolution and compact systems and the XGA a product well adapted for high resolution imaging systems. High electro-optical performances have been demonstrated with NETD ROIC design. This technology node paves the way to high end products as well as low end compact smaller formats like 320 x 240 and 160 x 120 or smaller.

  12. Uncooled amorphous silicon 1/4 VGA IRFPA with 25 μm pixel-pitch for high end applications

    Science.gov (United States)

    Crastes, A.; Tissot, J. L.; Vilain, M.; Legras, O.; Tinnes, S.; Minassian, C.; Robert, P.; Fieque, B.

    2008-04-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon layer enables ULIS to develop 384 x 288 (1/4 VGA) IRFPA formats with 25 μm pixel-pitch designed for high end applications. This detector ROIC design relies on the same architecture as the full TV format ROIC one (detector configuration by serial link, user defined amplifier gain, windowing capability ...). The detector package is identical as the 384 x 288 / 35 μm and 640 x 480 / 25 μm ones, enabling an easier system update or less non recurrent cost for different systems developments. This paper will give results of the IRFPA characterization. NETD in the range of 30 mK (f/1, 300 K, 60 Hz) and operability higher than 99.99 % are routinely achieved.

  13. X-ray tests of a microchannel plate detector and amorphous silicon pixel array readout for neutron radiography

    International Nuclear Information System (INIS)

    High-performance large area imaging detectors for fast neutrons in the 5-14 MeV energy range do not exist at present. The aim of this project is to combine microchannel plates or MCPs (or similar electron multiplication structures) traditionally used in image intensifiers and X-ray detectors with amorphous silicon (a-Si) pixel arrays to produce a composite converter and intensifier position sensitive imaging system. This detector will provide an order of magnitude improvement in image resolution when compared with current millimetre resolution limits obtained using phosphor or scintillator-based hydrogen rich converters. In this study we present the results of the initial experimental evaluation of the prototype system. This study was carried out using a medical X-ray source for the proof of concept tests, the next phase will involve neutron imaging tests. The hybrid detector described in this study is a unique development and paves the way for large area position sensitive detectors consisting of MCP or microsphere plate detectors and a-Si or polysilicon pixel arrays. Applications include neutron and X-ray imaging for terrestrial applications. The technology could be extended to space instrumentation for X-ray astronomy

  14. Gas avalanche pixel detectors with amorphous silicon carbide (a-Si:C:H) overcoating

    International Nuclear Information System (INIS)

    Performance of the gas avalanche pixel detectors of square and circular geometry, with and without semiconducting surface coating, was characterized in terms of gas gain and active region. Although the electric field profile of the square geometry cannot be radially uniform, a 200 microm pitch detector of this type exhibited a maximum gain of ∼ 12,000 which is comparable to that of the circular counterpart. Due to the existence of the anode bus lines passing under the cathodes, there is a defocusing effect of the drift field lines converging to the anodes, resulting in inactive regions where electrons produced from gas ionization are not collected at the anodes. Variation of the count rate with the drift field was measured to probe these defocusing effects. The p-type a-Si:C:H surface coating was effective in reducing these inactive regions

  15. ALICE Silicon Pixel Detector

    CERN Multimedia

    Manzari, V

    2013-01-01

    The Silicon Pixel Detector (SPD) forms the innermost two layers of the 6-layer barrel Inner Tracking System (ITS). The SPD plays a key role in the determination of the position of the primary collision and in the reconstruction of the secondary vertices from particle decays.

  16. Conception and modelling of photo-detection pixels. PIN photodiodes conceived in amorphous silicon for particles detection

    International Nuclear Information System (INIS)

    The research done has revealed that the a-Si:H is a material ideally suited for the detection of particles, while being resistant to radiation. It also has a low manufacturing cost, is compatible with existing technology and can be deposited over large areas. Thus, despite the low local mobility of charges (30 cm2/V/s), a-Si:H is a material of particular interest for manufacturing high-energy particle detection pixels. As a consequence of this, we have studied the feasibility of an experimental pixel stacked structure based on a-Si:H as a basic sensor element for an electromagnetic calorimeter. The structure of such a pixel consists of different components. First, a silicon PIN diode in a-Si:H is fabricated, followed by a bias resistor and a decoupling capacitor. Before such a structure is made and in order to optimize its design, it is essential to have an efficient behavioural model of the various components. Thus, our primary goal was to develop a two-dimensional physical model of the PIN diode using the SILVACO finite element calculation software. This a-Si:H PIN diode two-dimensional physical model allowed us to study the problem of crosstalk between pixels in a matrix structure of detectors. In particular, we concentrated on the leakage current and the current generated in the volume between neighbouring pixels. The successful implementation of this model in SPICE ensures its usefulness in other professional simulators and especially its integration into a complete electronic structure (PIN diode, bias resistor, decoupling capacity and low noise amplifier). Thanks to these modelling tools, we were able to simulate PIN diode structures in a-Si:H with different thicknesses and different dimensions. These simulations have allowed us to predict that the thicker structures are relevant to the design of the pixel detectors for high energy physics. Applications in astronomy, medical imaging and the analysis of the failure of silicon integrated circuits, can also be

  17. High-performance uncooled amorphous silicon video graphics array and extended graphics array infrared focal plane arrays with 17-μm pixel pitch

    Science.gov (United States)

    Tissot, Jean-Luc; Tinnes, Sébastien; Durand, Alain; Minassian, Christophe; Robert, Patrick; Vilain, Michel; Yon, Jean-Jacques

    2011-06-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon with 45, 35, and 25 μm enables ULIS to develop video graphics array (VGA) and extended graphics array (XGA) infrared focal plane array (IRFPA) formats with 17-μm pixel pitch to fulfill every application. These detectors keep all the recent innovations developed on the 25-μm pixel-pitch read out integrated circuit (ROIC) (detector configuration by serial link, low power consumption, and wide electrical dynamic range). The specific appeal of these units lies in the high spatial resolution it provides while keeping the small thermal time constant. The reduction of the pixel pitch turns the VGA array into a product well adapted for high-resolution and compact systems and the XGA a product well adapted for high-resolution imaging systems. High electro-optical performances have been demonstrated with noise equivalent temperature difference (NETD) ROIC design. This technology node paves the way to high-end products as well as low-end, compact, smaller formats, such as 320 × 240 and 160 × 120 or smaller.

  18. Uncooled amorphous silicon 1/4 VGA IRFPA with 25 μm pixel-pitch for high-end applications

    Science.gov (United States)

    Minassian, C.; Tissot, J. L.; Vilain, M.; Legras, O.; Tinnes, S.; Crastes, A.; Robert, P.; Fieque, B.

    2008-10-01

    The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon layer enables ULIS to develop 384 × 288 (1/4 VGA) IRFPA formats with 25 μm pixel-pitch designed for high end applications. This detector ROIC design relies on the same architecture as the full TV format ROIC one (detector configuration by serial link, user defined amplifier gain, windowing capability ...). The detector package is identical as the 384 × 288 / 35 μm and 640 × 480 / 25μm ones, enabling an easier system update or less non recurrent cost for different systems developments. This paper will give results of the IRFPA characterization. NETD in the range of 30mK (f/1, 300 K, 60 Hz) and operability higher than 99.99 % are routinely achieved.

  19. Amorphous silicon thermometer

    International Nuclear Information System (INIS)

    The carbon glass resistance thermometers (CGRT) shows an unstable drift by heat cycles. Since we were looking for a more stable element of thermometer for cryogenic and high magnetic field environments, we selected amorphous silicon as a substitute for CGRT. The resistance of many amorphous samples were measured at 4K, at 77K, and 300K. We eventually found an amorphous silicon (Si-H) alloy whose the sensitivity below 77K was comparable to that of the germanium resistance thermometer with little magnetic field influence. (author)

  20. Design and noise analysis of charge sensitive amplifier for readout of pixelized thin film amorphous silicon sensors

    CERN Document Server

    Poltorak, K; Jarron, P; Kaplon, J; 10.1109/NSSMIC.2008.4774982

    2009-01-01

    Future high-energy physics experiments entail the need to improve the existing detection technologies, as well as develop new ones. Larger luminosities of the new accelerators require greater granularity of tracking detectors, which will be exposed to much higher doses of radiation. One of the newly-investigated solutions for tracking detectors is the Thin Film on ASIC (TFA) technology, which allows combining advantages of Monolithic Active Pixel and Hybrid Pixel technologies. In the paper we present noise analysis of a front-end circuit for readout of a TFA sensor. The circuit is based on a charge sensitive preamplifier built around an un-buffered cascode stage with active reset circuit. The feedback capacitance is reset through a transistor biased with a constant current instead of a voltage controlled reset transistor in order to limit parasitic charge injection into a very small feedback capacitance. Detailed analysis of noise in the reset and the readout phase and design optimization based on the Enz-Kru...

  1. The ATLAS Silicon Pixel Sensors

    CERN Document Server

    Alam, M S; Einsweiler, K F; Emes, J; Gilchriese, M G D; Joshi, A; Kleinfelder, S A; Marchesini, R; McCormack, F; Milgrome, O; Palaio, N; Pengg, F; Richardson, J; Zizka, G; Ackers, M; Andreazza, A; Comes, G; Fischer, P; Keil, M; Klasen, V; Kühl, T; Meuser, S; Ockenfels, W; Raith, B; Treis, J; Wermes, N; Gössling, C; Hügging, F G; Wüstenfeld, J; Wunstorf, R; Barberis, D; Beccherle, R; Darbo, G; Gagliardi, G; Gemme, C; Morettini, P; Musico, P; Osculati, B; Parodi, F; Rossi, L; Blanquart, L; Breugnon, P; Calvet, D; Clemens, J-C; Delpierre, P A; Hallewell, G D; Laugier, D; Mouthuy, T; Rozanov, A; Valin, I; Aleppo, M; Caccia, M; Ragusa, F; Troncon, C; Lutz, Gerhard; Richter, R H; Rohe, T; Brandl, A; Gorfine, G; Hoeferkamp, M; Seidel, SC; Boyd, GR; Skubic, P L; Sícho, P; Tomasek, L; Vrba, V; Holder, M; Ziolkowski, M; D'Auria, S; del Papa, C; Charles, E; Fasching, D; Becks, K H; Lenzen, G; Linder, C

    2001-01-01

    Prototype sensors for the ATLAS silicon pixel detector have been developed. The design of the sensors is guided by the need to operate them in the severe LHC radiation environment at up to several hundred volts while maintaining a good signal-to-noise ratio, small cell size, and minimal multiple scattering. The ability to be operated under full bias for electrical characterization prior to the attachment of the readout integrated circuit electronics is also desired.

  2. Amorphous silicon based particle detectors

    OpenAIRE

    Wyrsch, N; Franco, A; Riesen, Y.; Despeisse, M; S. Dunand; Powolny, F; Jarron, P.; Ballif, C.

    2012-01-01

    Radiation hard monolithic particle sensors can be fabricated by a vertical integration of amorphous silicon particle sensors on top of CMOS readout chip. Two types of such particle sensors are presented here using either thick diodes or microchannel plates. The first type based on amorphous silicon diodes exhibits high spatial resolution due to the short lateral carrier collection. Combination of an amorphous silicon thick diode with microstrip detector geometries permits to achieve micromete...

  3. Simulation in Amorphous Silicon and Amorphous Silicon Carbide Pin Diodes

    OpenAIRE

    Gonçalves, Dora; Fernandes, Miguel; Louro, Paula; Fantoni, Alessandro; Vieira, Manuela

    2014-01-01

    Part 21: Electronics: Devices International audience Photodiodes are devices used as image sensors, reactive to polychromatic light and subsequently color detecting, and they are also used in optical communication applications. To improve these devices performance it is essential to study and control their characteristics, in fact their capacitance and spectral and transient responses. This study considers two types of diodes, an amorphous silicon pin and an amorphous silicon carbide pi...

  4. Plasma Deposition of Amorphous Silicon

    Science.gov (United States)

    Calcote, H. F.

    1982-01-01

    Strongly adhering films of silicon are deposited directly on such materials as Pyrex and Vycor (or equivalent materials) and aluminum by a non-equilibrium plasma jet. Amorphous silicon films are formed by decomposition of silicon tetrachloride or trichlorosilane in the plasma. Plasma-jet technique can also be used to deposit an adherent silicon film on aluminum from silane and to dope such films with phosphorus. Ability to deposit silicon films on such readily available, inexpensive substrates could eventually lead to lower cost photovoltaic cells.

  5. The ALICE Silicon Pixel Detector System (SPD)

    CERN Document Server

    Kluge, A; Antinori, Federico; Burns, M; Cali, I A; Campbell, M; Caselle, M; Ceresa, S; Dima, R; Elias, D; Fabris, D; Krivda, Marian; Librizzi, F; Manzari, Vito; Morel, M; Moretto, Sandra; Osmic, F; Pappalardo, G S; Pepato, Adriano; Pulvirenti, A; Riedler, P; Riggi, F; Santoro, R; Stefanini, G; Torcato De Matos, C; Turrisi, R; Tydesjo, H; Viesti, G; PH-EP

    2007-01-01

    The ALICE silicon pixel detector (SPD) comprises the two innermost layers of the ALICE inner tracker system. The SPD includes 120 detector modules (half-staves) each consisting of 10 ALICE pixel chips bump bonded to two silicon sensors and one multi-chip read-out module. Each pixel chip contains 8192 active cells, so that the total number of pixel cells in the SPD is ≈ 107. The on-detector read-out is based on a multi-chip-module containing 4 ASICs and an optical transceiver module. The constraints on material budget and detector module dimensions are very demanding.

  6. ISPA (imaging silicon pixel array) experiment

    CERN Multimedia

    Patrice Loïez

    2002-01-01

    The bump-bonded silicon pixel detector, developed at CERN by the EP-MIC group, is shown here in its ceramic carrier. Both represent the ISPA-tube anode. The chip features between 1024 (called OMEGA-1) and 8196 (ALICE-1) active pixels.

  7. Amorphous Silicon Display Backplanes on Plastic Substrates

    Science.gov (United States)

    Striakhilev, Denis; Nathan, Arokia; Vygranenko, Yuri; Servati, Peyman; Lee, Czang-Ho; Sazonov, Andrei

    2006-12-01

    Amorphous silicon (a-Si) thin-film transistor (TFT) backplanes are very promising for active-matrix organic light-emitting diode displays (AMOLEDs) on plastic. The technology benefits from a large manufacturing base, simple fabrication process, and low production cost. The concern lies in the instability of the TFTs threshold voltage (VT) and its low device mobility. Although VT-instability can be compensated by means of advanced multi-transistor pixel circuits, the lifetime of the display is still dependent on the TFT process quality and bias conditions. A-Si TFTs with field-effect mobility of 1.1 cm2/V · s and pixel driver circuits have been fabricated on plastic substrates at 150 °C. The circuits are characterized in terms of current drive capability and long-term stability of operation. The results demonstrate sufficient and stable current delivery and the ability of the backplane on plastic to meet AMOLED requirements.

  8. Amorphous silicon crystalline silicon heterojunction solar cells

    CERN Document Server

    Fahrner, Wolfgang Rainer

    2013-01-01

    Amorphous Silicon/Crystalline Silicon Solar Cells deals with some typical properties of heterojunction solar cells, such as their history, the properties and the challenges of the cells, some important measurement tools, some simulation programs and a brief survey of the state of the art, aiming to provide an initial framework in this field and serve as a ready reference for all those interested in the subject. This book helps to ""fill in the blanks"" on heterojunction solar cells. Readers will receive a comprehensive overview of the principles, structures, processing techniques and the curre

  9. Exoelectron analysis of amorphous silicon

    Science.gov (United States)

    Dekhtyar, Yu. D.; Vinyarskaya, Yu. A.

    1994-04-01

    The method based on registration of photothermostimulated exoelectron emission (PTSE) is used in the proposed new field of investigating the structural defects in amorphous silicon (a-Si). This method can be achieved if the sample under investigation is simultaneously heated and illuminated by ultraviolet light. The mechanism of PTSE from a-Si has been studied in the case of a hydrogenized amorphous silicon (a-Si:H) film grown by glow discharge method. The electronic properties and annealing of defects were analyzed in the study. It has been shown from the results that the PTSE from a-Si:H takes place as a prethreshold single-photon external photoeffect. The exoemission spectroscopy of a-Si:H was shown to be capable in the study of thermally and optically stimulated changes in the electronic structure of defects, their annealing, as well as diffusion of atomic particles, such as hydrogen.

  10. Colloidal Photoluminescent Amorphous Porous Silicon, Methods Of Making Colloidal Photoluminescent Amorphous Porous Silicon, And Methods Of Using Colloidal Photoluminescent Amorphous Porous Silicon

    KAUST Repository

    Chaieb, Sahraoui

    2015-04-09

    Embodiments of the present disclosure provide for a colloidal photoluminescent amorphous porous silicon particle suspension, methods of making a colloidal photoluminescent amorphous porous silicon particle suspension, methods of using a colloidal photoluminescent amorphous porous silicon particle suspension, and the like.

  11. Amorphous silicon based betavoltaic devices

    OpenAIRE

    Wyrsch, N; Riesen, Y.; Franco, A; S. Dunand; Kind, H.; Schneider, S.; Ballif, C.

    2013-01-01

    Hydrogenated amorphous silicon betavoltaic devices are studied both by simulation and experimentally. Devices exhibiting a power density of 0.1 μW/cm2 upon Tritium exposure were fabricated. However, a significant degradation of the performance is taking place, especially during the first hours of the exposure. The degradation behavior differs from sample to sample as well as from published results in the literature. Comparisons with degradation from beta particles suggest an effect of tritium...

  12. Electrical characteristics of silicon pixel detectors

    Energy Technology Data Exchange (ETDEWEB)

    Gorelov, I.; Gorfine, G.; Hoeferkamp, M.; Mata-Bruni, V.; Santistevan, G.; Seidel, S.C. E-mail: seidel@dot.phys.unm.edu; Ciocio, A.; Einsweiler, K.; Emes, J.; Gilchriese, M.; Joshi, A.; Kleinfelder, S.; Marchesini, R.; McCormack, F.; Milgrome, O.; Palaio, N.; Pengg, F.; Richardson, J.; Zizka, G.; Ackers, M.; Comes, G.; Fischer, P.; Keil, M.; Martinez, G.; Peric, I.; Runolfsson, O.; Stockmanns, T.; Treis, J.; Wermes, N.; Goessling, C.; Huegging, F.; Klaiber-Lodewigs, J.; Krasel, O.; Wuestenfeld, J.; Wunstorf, R.; Barberis, D.; Beccherle, R.; Caso, C.; Cervetto, M.; Darbo, G.; Gagliardi, G.; Gemme, C.; Morettini, P.; Netchaeva, P.; Osculati, B.; Rossi, L.; Charles, E.; Fasching, D.; Blanquart, L.; Breugnon, P.; Calvet, D.; Clemens, J.-C.; Delpierre, P.; Hallewell, G.; Laugier, D.; Mouthuy, T.; Rozanov, A.; Valin, I.; Andreazza, A.; Caccia, M.; Citterio, M.; Lari, T.; Meroni, C.; Ragusa, F.; Troncon, C.; Vegni, G.; Lutz, G.; Richter, R.H.; Rohe, T.; Boyd, G.R.; Skubic, P.L.; Sicho, P.; Tomasek, L.; Vrba, V.; Holder, M.; Ziolkowski, M.; Cauz, D.; Cobal-Grassmann, M.; D' Auria, S.; De Lotto, B.; Del Papa, C.; Grassmann, H.; Santi, L.; Becks, K.H.; Lenzen, G.; Linder, C

    2002-08-21

    Prototype sensors for the ATLAS silicon pixel detector have been electrically characterized. The current and voltage characteristics, charge-collection efficiencies, and resolutions have been examined. Devices were fabricated on oxygenated and standard detector-grade silicon wafers. Results from prototypes which examine p-stop and standard and moderated p-spray isolation are presented for a variety of geometrical options. Some of the comparisons relate unirradiated sensors with those that have received fluences relevant to LHC operation.

  13. Electrical Characteristics of Silicon Pixel Sensors

    CERN Document Server

    Gorelov, I; Hoeferkamp, M; Mata-Bruni, V; Santistevan, G; Seidel, S C; Ciocio, A; Einsweiler, K F; Emes, J; Gilchriese, M G D; Joshi, A; Kleinfelder, S A; Marchesini, R; McCormack, F; Milgrome, O; Palaio, N; Pengg, F; Richardson, J; Zizka, G; Ackers, M; Comes, G; Fischer, P; Keil, M; Klasen, V; Kühl, T; Meuser, S; Ockenfels, W; Raith, B; Treis, J; Wermes, N; Gössling, C; Hügging, F G; Klaiber Lodewigs, Jonas M; Krasel, O; Wüstenfeld, J; Wunstorf, R; Barberis, D; Beccherle, R; Caso, Carlo; Cervetto, M; Darbo, G; Gagliardi, G; Gemme, C; Morettini, P; Netchaeva, P; Osculati, B; Rossi, L; Charles, E; Fasching, D; Blanquart, L; Breugnon, P; Calvet, D; Clemens, J-C; Delpierre, P A; Hallewell, G D; Laugier, D; Mouthuy, T; Rozanov, A; Valin, I; Andreazza, A; Caccia, M; Citterio, M; Lari, T; Meroni, C; Ragusa, F; Troncon, C; Vegni, G; Lutz, Gerhard; Richter, R H; Rohe, T; Boyd, GR; Skubic, P L; Sícho, P; Tomasek, L; Vrba, V; Holder, M; Ziolkowski, M; Cauz, D; Cobal-Grassmann, M; D'Auria, S; De Lotto, B; del Papa, C; Grassmann, H; Santi, L; Becks, K H; Lenzen, G; Linder, C

    2001-01-01

    Prototype sensors for the ATLAS silicon pixel detector have been electrically characterized. The current and voltage characteristics, charge collection efficiencies, and resolutions have been examined. Devices were fabricated on oxygenated and standard detector-grade silicon wafers. Results from prototypes which examine p-stop and standard and moderated p-spray isolation are presented for a variety of geometrical options. Some of the comparisons relate unirradiated sensors with those that have received fluences relevant to LHC operation.

  14. Amorphous-silicon cell reliability testing

    Science.gov (United States)

    Lathrop, J. W.

    1985-01-01

    The work on reliability testing of solar cells is discussed. Results are given on initial temperature and humidity tests of amorphous silicon devices. Calibration and measurement procedures for amorphous and crystalline cells are given. Temperature stress levels are diagrammed.

  15. Amorphous silicon based solar cells

    OpenAIRE

    Al Tarabsheh, Anas

    2007-01-01

    This thesis focuses on the deposition of hydrogenated amorphous silicon (a-Si:H) films bymeans of plasma enhanced chemical vapour deposition (PECVD). This technique allows the growth of device quality a-Si:H at relatively low deposition temperatures, below 140 °C and, therefore, enables the use of low-cost substrates, e.g. plastic foils. The maximum efficiencies of a-Si:H solar cells in this work are η= 6.8 % at a deposition temperature Tdep = 180 °C and η = 4.9 % at a deposition ...

  16. Amorphous silicon based radiation detectors

    International Nuclear Information System (INIS)

    We describe the characteristics of thin(1 μm) and thick (>30μm) hydrogenated amorphous silicon p-i-n diodes which are optimized for detecting and recording the spatial distribution of charged particles, x-rays and γ rays. For x-ray, γ ray, and charged particle detection we can use thin p-i-n photosensitive diode arrays coupled to evaporated layers of suitable scintillators. For direct detection of charged particles with high resistance to radiation damage, we use the thick p-i-n diode arrays. 13 refs., 7 figs

  17. Charge sharing in silicon pixel detectors

    CERN Document Server

    Mathieson, K; Seller, P; Prydderch, M L; O'Shea, V; Bates, R L; Smith, K M; Rahman, M

    2002-01-01

    We used a pixellated hybrid silicon X-ray detector to study the effect of the sharing of generated charge between neighbouring pixels over a range of incident X-ray energies, 13-36 keV. The system is a room temperature, energy resolving detector with a Gaussian FWHM of 265 eV at 5.9 keV. Each pixel is 300 mu m square, 300 mu m deep and is bump bonded to matching read out electronics. The modelling packages MEDICI and MCNP were used to model the complete X-ray interaction and the subsequent charge transport. Using this software a model is developed which reproduces well the experimental results. The simulations are then altered to explore smaller pixel sizes and different X-ray energies. Charge sharing was observed experimentally to be 2% at 13 keV rising to 4.5% at 36 keV, for an energy threshold of 4 keV. The models predict that up to 50% of charge may be lost to the neighbouring pixels, for an X-ray energy of 36 keV, when the pixel size is reduced to 55 mu m.

  18. ISPA (imaging silicon pixel array) experiment

    CERN Multimedia

    Patrice Loïez

    2002-01-01

    The ISPA tube is a position-sensitive photon detector. It belongs to the family of hybrid photon detectors (HPD), recently developed by CERN and INFN with leading photodetector firms. HPDs confront in a vacuum envelope a photocathode and a silicon detector. This can be a single diode or a pixelized detector. The electrons generated by the photocathode are efficiently detected by the silicon anode by applying a high-voltage difference between them. ISPA tube can be used in high-energy applications as well as bio-medical and imaging applications.

  19. Uncooled amorphous silicon TEC-less 1/4 VGA IRFPA with 25μm pixel-pitch for high volume applications

    Science.gov (United States)

    Durand, A.; Minassian, C.; Tissot, J. L.; Vilain, M.; Robert, P.; Touvignon, A.; Chiappa, J. M.; Pistre, C.

    2009-05-01

    The high level of accumulated expertise by ULIS on uncooled microbolometers TEC-less operation enables ULIS to develop 384 x 288 (1/4 VGA) IRFPA format with 25μm pixel-pitch especially designed for TEC-less application. This detector, while keeping all the performances and all the innovations developed on previous ULIS ROIC (NETD performance, detector configuration by serial link, low power consumption and wide electrical dynamic range ...), can be operated on a wide range of ambient temperature, with constant settings. We present in this paper the electro-optical performances and the TEC-less capability of this device. The thermal behavior is described in detail.

  20. Investigation of Sb diffusion in amorphous silicon

    OpenAIRE

    Csik, A.; Langer, G A; Erdelyi, G.; Beke, D. L.; Erdelyi, Z.; Vad, K.

    2009-01-01

    Amorphous silicon materials and its alloys become extensively used in some technical applications involving large area of the microelectronic and optoelectronic devices. However, the amorphous-crystalline transition, segregation and diffusion processes still have numerous unanswered questions. In this work we study the Sb diffusion into an amorphous Si film by means of Secondary Neutral Mass Spectrometry (SNMS). Amorphous Si/Si1-xSbx/Si tri-layer samples with 5 at% antimony concentration were...

  1. Tests Of Amorphous-Silicon Photovoltaic Modules

    Science.gov (United States)

    Ross, Ronald G., Jr.

    1988-01-01

    Progress in identification of strengths and weaknesses of amorphous-silicon technology detailed. Report describes achievements in testing reliability of solar-power modules made of amorphous-silicon photovoltaic cells. Based on investigation of modules made by U.S. manufacturers. Modules subjected to field tests, to accelerated-aging tests in laboratory, and to standard sequence of qualification tests developed for modules of crystalline-silicon cells.

  2. Amorphous silicon based large format uncooled FPA microbolometer technology

    Science.gov (United States)

    Schimert, T.; Brady, J.; Fagan, T.; Taylor, M.; McCardel, W.; Gooch, R.; Ajmera, S.; Hanson, C.; Syllaios, A. J.

    2008-04-01

    This paper presents recent developments in next generation microbolometer Focal Plane Array (FPA) technology at L-3 Communications Infrared Products (L-3 CIP). Infrared detector technology at L-3 CIP is based on hydrogenated amorphous silicon (a-Si:H) and amorphous silicon germanium(a-SiGe:H). Large format high performance, fast, and compact IR FPAs are enabled by a low thermal mass pixel design; favorable material properties; an advanced ROIC design; and wafer level packaging. Currently at L-3 CIP, 17 micron pixel FPA array technology including 320x240, 640 x 480 and 1024 x768 arrays is under development. Applications of these FPAs range from low power microsensors to high resolution near-megapixel imager systems.

  3. The ALICE silicon pixel detector readout electronics

    CERN Document Server

    Krivda, M; Burns, M; Caselle, M; Kluge, A; Manzari, V; Torcato de Matos, C; Morel, M; Riedler, P; Aglieri Rinella, G; Sandor, L; Stefanini, G

    2010-01-01

    The ALICE silicon pixel detector (SPD) constitutes the two innermost layers of the ALICE inner tracking system (ALICE Collaboration, 1999) [1]. The SPD is built with 120 detector modules (half-staves) and contains about 10 million pixels in total. The half-staves are connected to the off-detector electronics, housed in a control room 100 m away, via bidirectional optical links. The stream of data from the front-end electronics is processed in 20 VME readout modules, called routers, based on FPGAs. Three 2-channel link-receiver daughter cards, also based on FPGAs, are plugged in each router. Each link-receiver card receives data via the optical link from two half-staves, applies the zero suppression and passes them to the router to be processed and sent to the ALICE–DAQ system through the detector data link (DDL). The SPD control, configuration and data monitoring are performed using the VME interface embedded in the router.

  4. The ALICE silicon pixel detector readout electronics

    International Nuclear Information System (INIS)

    The ALICE silicon pixel detector (SPD) constitutes the two innermost layers of the ALICE inner tracking system (ALICE Collaboration, 1999) . The SPD is built with 120 detector modules (half-staves) and contains about 10 million pixels in total. The half-staves are connected to the off-detector electronics, housed in a control room 100 m away, via bidirectional optical links. The stream of data from the front-end electronics is processed in 20 VME readout modules, called routers, based on FPGAs. Three 2-channel link-receiver daughter cards, also based on FPGAs, are plugged in each router. Each link-receiver card receives data via the optical link from two half-staves, applies the zero suppression and passes them to the router to be processed and sent to the ALICE-DAQ system through the detector data link (DDL). The SPD control, configuration and data monitoring are performed using the VME interface embedded in the router.

  5. The ALICE Silicon Pixel Detector System

    CERN Document Server

    Fadmar Osmic, FO

    2006-01-01

    The European Organization for Particle Physics (CERN) in Geneva is currently constructing the Large Hadron Collider (LHC), which will allow the study of the subnuclear ranges of physics with an accuracy never achieved before. Within the LHC project, ALICE is to the study of strongly interacting matter at extreme densities and high temperatures. ALICE as many other modern High Energy Physics (HEP) experiments uses silicon pixel detectors for tracking close to the interaction point (IP). The ALICE Silicon Pixel Detector (SPD) will constitute the two innermost layers of ALICE, and will due to its high granularity provide precise tracking information. In heavy ion collisions, the track density could be as high as 80 tracks/cm2 in the first SPD layer. The SPD will provide tracking information at radii of 3.9 and 7.6 cm from the IP. It is a fundamental element for the study of the weak decays of the particles carrying heavy flavour, whose typical signature will be a secondary vertex separated from the primary verte...

  6. Development of silicon micropattern pixel detectors

    International Nuclear Information System (INIS)

    Successive versions of high speed, active silicon pixel detectors with integrated readout electronics have been developed for particle physics experiments using monolithic and hybrid technologies. Various matrices with binary output as well as a linear detector with analog output have been made. The hybrid binary matrix with 1024 cells (dimension 75 μmx500 μm) can capture events at similar 5 MHz and a selected event can then be read out in 109Cd source a noise level of 170 e-r.m.s. (1.4 keV fwhm) has been measured with a threshold non-uniformity of 750 e- r.m.s. Objectives of the development work are the increase of the size of detecting area without loss of efficiency, the design of an appropriate readout architecture for collider operation, the reduction of material thickness in the detector, understanding of the threshold non-uniformity, study of the sensitivity of the pixel matrices to light and low energy electrons for scintillating fiber detector readout and last but not least, the optimization of cost and yield of the pixel detectors in production. ((orig.))

  7. Raman Amplifier Based on Amorphous Silicon Nanoparticles

    OpenAIRE

    M.A. Ferrara; Rendina, I.; S. N. Basu; Dal Negro, L.; Sirleto, L.

    2012-01-01

    The observation of stimulated Raman scattering in amorphous silicon nanoparticles embedded in Si-rich nitride/silicon superlattice structures (SRN/Si-SLs) is reported. Using a 1427 nm continuous-wavelength pump laser, an amplification of Stokes signal up to 0.9 dB/cm at 1540.6 nm and a significant reduction in threshold power of about 40% with respect to silicon are experimentally demonstrated. Our results indicate that amorphous silicon nanoparticles are a great promise for Si-based Raman la...

  8. Laser annealing of hydrogen implanted amorphous silicon

    International Nuclear Information System (INIS)

    Amorphous silicon, prepared by silicon bombardment at energies of 200 to 250 keV, was implanted with 40 keV H2+ to peak concentrations up to 15 at .% and recrystallized in air by single 20 nsec pulses at 1.06 μm from a Nd:glass laser. Amorphous layer formation and recrystallization were verified using Raman spectroscopy and ion backscattering/channeling analysis

  9. Electron tunnelling into amorphous germanium and silicon.

    Science.gov (United States)

    Smith, C. W.; Clark, A. H.

    1972-01-01

    Measurements of tunnel conductance versus bias, capacitance versus bias, and internal photoemission were made in the systems aluminum-oxide-amorphous germanium and aluminium-oxide-amorphous silicon. A function was extracted which expresses the deviation of these systems from the aluminium-oxide-aluminium system.

  10. Challenges in amorphous silicon solar cell technology

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon is nowadays extensively used for a range of devices, amongst others solar cells. Solar cell technology has matured over the last two decades and resulted in conversion efficiencies in excess of 15%. In this paper the operation of amorphous silicon solar cells is briefly described. For tandem solar cell, amorphous silicon germanium is often used as material for the intrinsic layer of the bottom cell. This improves the red response of the cell. In order to optimize the performance of amorphous silicon germanium solar cells, profiling of the germanium concentration near the interfaces is applied. We show in this paper that the performance is strongly dependent on the width of the grading near the interfaces. The best performance is achieved when using a grading width that is as small as possible near the p-i interface and as wide as possible near the i-n interface. High-rate deposition of amorphous silicon is nowadays one of the main issues. Using the Expanding Thermal Plasma deposition method very high deposition rates can be achieved. This method has been applied for the fabrication of an amorphous silicon solar cell with a conversion efficiency of 5,8%. (authors)

  11. Atomic-scale disproportionation in amorphous silicon monoxide.

    Science.gov (United States)

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphous structure characterized by angstrom-beam electron diffraction, supplemented by synchrotron X-ray scattering and computer simulations. In addition to the theoretically predicted amorphous silicon and silicon-dioxide clusters, suboxide-type tetrahedral coordinates are detected by angstrom-beam electron diffraction at silicon/silicon-dioxide interfaces, which provides compelling experimental evidence on the atomic-scale disproportionation of amorphous silicon monoxide. Eventually we develop a heterostructure model of the disproportionated silicon monoxide which well explains the distinctive structure and properties of the amorphous material. PMID:27172815

  12. Atomic-scale disproportionation in amorphous silicon monoxide

    Science.gov (United States)

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphous structure characterized by angstrom-beam electron diffraction, supplemented by synchrotron X-ray scattering and computer simulations. In addition to the theoretically predicted amorphous silicon and silicon-dioxide clusters, suboxide-type tetrahedral coordinates are detected by angstrom-beam electron diffraction at silicon/silicon-dioxide interfaces, which provides compelling experimental evidence on the atomic-scale disproportionation of amorphous silicon monoxide. Eventually we develop a heterostructure model of the disproportionated silicon monoxide which well explains the distinctive structure and properties of the amorphous material. PMID:27172815

  13. Amorphous silicon detectors in positron emission tomography

    Energy Technology Data Exchange (ETDEWEB)

    Conti, M. (Istituto Nazionale di Fisica Nucleare, Pisa (Italy) Lawrence Berkeley Lab., CA (USA)); Perez-Mendez, V. (Lawrence Berkeley Lab., CA (USA))

    1989-12-01

    The physics of the detection process is studied and the performances of different Positron Emission Tomography (PET) system are evaluated by theoretical calculation and/or Monte Carlo Simulation (using the EGS code) in this paper, whose table of contents can be summarized as follows: a brief introduction to amorphous silicon detectors and some useful equation is presented; a Tantalum/Amorphous Silicon PET project is studied and the efficiency of the systems is studied by Monte Carlo Simulation; two similar CsI/Amorphous Silicon PET projects are presented and their efficiency and spatial resolution are studied by Monte Carlo Simulation, light yield and time characteristics of the scintillation light are discussed for different scintillators; some experimental result on light yield measurements are presented; a Xenon/Amorphous Silicon PET is presented, the physical mechanism of scintillation in Xenon is explained, a theoretical estimation of total light yield in Xenon and the resulting efficiency is discussed altogether with some consideration of the time resolution of the system; the amorphous silicon integrated electronics is presented, total noise and time resolution are evaluated in each of our applications; the merit parameters {epsilon}{sup 2}{tau}'s are evaluated and compared with other PET systems and conclusions are drawn; and a complete reference list for Xenon scintillation light physics and its applications is presented altogether with the listing of the developed simulation programs.

  14. Amorphous silicon detectors in positron emission tomography

    International Nuclear Information System (INIS)

    The physics of the detection process is studied and the performances of different Positron Emission Tomography (PET) system are evaluated by theoretical calculation and/or Monte Carlo Simulation (using the EGS code) in this paper, whose table of contents can be summarized as follows: a brief introduction to amorphous silicon detectors and some useful equation is presented; a Tantalum/Amorphous Silicon PET project is studied and the efficiency of the systems is studied by Monte Carlo Simulation; two similar CsI/Amorphous Silicon PET projects are presented and their efficiency and spatial resolution are studied by Monte Carlo Simulation, light yield and time characteristics of the scintillation light are discussed for different scintillators; some experimental result on light yield measurements are presented; a Xenon/Amorphous Silicon PET is presented, the physical mechanism of scintillation in Xenon is explained, a theoretical estimation of total light yield in Xenon and the resulting efficiency is discussed altogether with some consideration of the time resolution of the system; the amorphous silicon integrated electronics is presented, total noise and time resolution are evaluated in each of our applications; the merit parameters ε2τ's are evaluated and compared with other PET systems and conclusions are drawn; and a complete reference list for Xenon scintillation light physics and its applications is presented altogether with the listing of the developed simulation programs

  15. Transverse and longitudinal vibrations in amorphous silicon

    Science.gov (United States)

    Beltukov, Y. M.; Fusco, C.; Tanguy, A.; Parshin, D. A.

    2015-12-01

    We show that harmonic vibrations in amorphous silicon can be decomposed to transverse and longitudinal components in all frequency range even in the absence of the well defined wave vector q. For this purpose we define the transverse component of the eigenvector with given ω as a component, which does not change the volumes of Voronoi cells around atoms. The longitudinal component is the remaining orthogonal component. We have found the longitudinal and transverse components of the vibrational density of states for numerical model of amorphous silicon. The vibrations are mostly transverse below 7 THz and above 15 THz. In the frequency interval in between the vibrations have a longitudinal nature. Just this sudden transformation of vibrations at 7 THz from almost transverse to almost longitudinal ones explains the prominent peak in the diffusivity of the amorphous silicon just above 7 THz.

  16. Atomic-scale disproportionation in amorphous silicon monoxide

    OpenAIRE

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphou...

  17. DEFECTS IN AMORPHOUS CHALCOGENIDES AND SILICON

    OpenAIRE

    Adler, D.

    1981-01-01

    Our comprehension of the physical properties of amorphous semiconductors has improved considerably over the past few years, but many puzzles remain. From our present perspective, the major features of chalcogenide glasses appear to be well understood, and some of the fine points which have arisen recently have been explained within the same general model. On the other hand, there are a grear number of unresolved mysteries with regard to amorphous silicon-based alloys. In this paper, the valen...

  18. Neutron irradiation induced amorphization of silicon carbide

    Energy Technology Data Exchange (ETDEWEB)

    Snead, L.L.; Hay, J.C. [Oak Ridge National Lab., TN (United States)

    1998-09-01

    This paper provides the first known observation of silicon carbide fully amorphized under neutron irradiation. Both high purity single crystal hcp and high purity, highly faulted (cubic) chemically vapor deposited (CVD) SiC were irradiated at approximately 60 C to a total fast neutron fluence of 2.6 {times} 10{sup 25} n/m{sup 2}. Amorphization was seen in both materials, as evidenced by TEM, electron diffraction, and x-ray diffraction techniques. Physical properties for the amorphized single crystal material are reported including large changes in density ({minus}10.8%), elastic modulus as measured using a nanoindentation technique ({minus}45%), hardness as measured by nanoindentation ({minus}45%), and standard Vickers hardness ({minus}24%). Similar property changes are observed for the critical temperature for amorphization at this neutron dose and flux, above which amorphization is not possible, is estimated to be greater than 130 C.

  19. Neutron irradiation induced amorphization of silicon carbide

    International Nuclear Information System (INIS)

    This paper provides the first known observation of silicon carbide fully amorphized under neutron irradiation. Both high purity single crystal hcp and high purity, highly faulted (cubic) chemically vapor deposited (CVD) SiC were irradiated at approximately 60 C to a total fast neutron fluence of 2.6 x 1025 n/m2. Amorphization was seen in both materials, as evidenced by TEM, electron diffraction, and x-ray diffraction techniques. Physical properties for the amorphized single crystal material are reported including large changes in density (-10.8%), elastic modulus as measured using a nanoindentation technique (-45%), hardness as measured by nanoindentation (-45%), and standard Vickers hardness (-24%). Similar property changes are observed for the critical temperature for amorphization at this neutron dose and flux, above which amorphization is not possible, is estimated to be greater than 130 C

  20. Structural relaxation of amorphous silicon carbide

    International Nuclear Information System (INIS)

    We have examined amorphous structures of silicon carbide (SiC) using both transmission electron microscopy and a molecular-dynamics approach. Radial distribution functions revealed that amorphous SiC contains not only heteronuclear (Si-C) bonds but also homonuclear (Si-Si and C-C) bonds. The ratio of heteronuclear to homonuclear bonds was found to change upon annealing, suggesting that structural relaxation of the amorphous SiC occurred. Good agreement was obtained between the simulated and experimentally measured radial distribution functions

  1. Structural relaxation of amorphous silicon carbide.

    Science.gov (United States)

    Ishimaru, Manabu; Bae, In-Tae; Hirotsu, Yoshihiko; Matsumura, Syo; Sickafus, Kurt E

    2002-07-29

    We have examined amorphous structures of silicon carbide (SiC) using both transmission electron microscopy and a molecular-dynamics approach. Radial distribution functions revealed that amorphous SiC contains not only heteronuclear (Si-C) bonds but also homonuclear (Si-Si and C-C) bonds. The ratio of heteronuclear to homonuclear bonds was found to change upon annealing, suggesting that structural relaxation of the amorphous SiC occurred. Good agreement was obtained between the simulated and experimentally measured radial distribution functions. PMID:12144449

  2. Inverted amorphous silicon solar cell utilizing cermet layers

    Science.gov (United States)

    Hanak, Joseph J.

    1979-01-01

    An amorphous silicon solar cell incorporating a transparent high work function metal cermet incident to solar radiation and a thick film cermet contacting the amorphous silicon opposite to said incident surface.

  3. NMR INVESTIGATIONS OF HYDROGENATED AMORPHOUS SILICON

    OpenAIRE

    J. Reimer

    1981-01-01

    A review is presented of the N.M.R. (Nuclear Magnetic Resonance) studies to date of hydrogenated amorphous silicon-hydrogen films. Structural features of proton N.M.R. lineshapes, dynamics of hydrogen containing defect sites, and the promise of quantitative determinations of local silicon-hydrogen bonding environments are discussed in detail. Finally, some comments are given on future directions for N.M.R. studies of hydrogenated thin films.

  4. Stable Transistors in Hydrogenated Amorphous Silicon

    OpenAIRE

    J. M. Shannon

    2004-01-01

    Thin-film field-effect transistors in hydrogenated amorphous silicon are notoriously unstable due to the formation of silicon dangling bond trapping states in the accumulated channel region during operation. Here, we show that by using a source-gated transistor a major improvement in stability is obtained. This occurs because the electron quasi-Fermi level is pinned near the center of the band in the active source region of the device and strong accumulation of electrons is prevented. The use...

  5. Noise and degradation of amorphous silicon devices

    NARCIS (Netherlands)

    Bakker, J.P.R.

    2003-01-01

    Electrical noise measurements are reported on two devices of the disordered semiconductor hydrogenated amorphous silicon (a-Si:H). The material is applied in sandwich structures and in thin-film transistors (TFTs). In a sandwich configuration of an intrinsic layer and two thin doped layers, the obse

  6. Film adhesion in amorphous silicon solar cells

    Indian Academy of Sciences (India)

    A R M Yusoff; M N Syahrul; K Henkel

    2007-08-01

    A major issue encountered during fabrication of triple junction -Si solar cells on polyimide substrates is the adhesion of the solar cell thin films to the substrates. Here, we present our study of film adhesion in amorphous silicon solar cells made on different polyimide substrates (Kapton VN, Upilex-S and Gouldflex), and the effect of tie coats on film adhesion.

  7. Preparation of hydrogenated amorphous silicon tin alloys

    OpenAIRE

    Vergnat, M.; Marchal, G.; Piecuch, M.

    1987-01-01

    This paper describes a new method to obtain hydrogenated amorphous semiconductor alloys. The method is reactive co-evaporation. Silicon tin hydrogenated alloys are prepared under atomic hydrogen atmosphere. We discuss the influence of various parameters of preparation (hydrogen pressure, tungsten tube temperature, substrate temperature, annealing...) on electrical properties of samples.

  8. Simulation of signal in irradiated silicon pixel detectors

    CERN Document Server

    Kramberger, G

    2003-01-01

    Induced currents in silicon pixel detectors of different geometries were simulated. The general properties of charge collection in irradiated segmented devices were investigated. A significant difference in charge collection efficiency (CCE) between n**+-n and p **+-n detectors was predicted after irradiation to the LHC fluences. A possible use of silicon detectors for the LHC upgrade was investigated by simulation of thin pixel sensors. The reduced CCE due to charge trapping seems to be the largest obstacle for their use.

  9. Preliminary modulation transfer function study on amorphous silicon

    International Nuclear Information System (INIS)

    Modulation Transfer Function, (MTF) is the scientific means of evaluating the fundamental spatial resolution performance of an imaging system. In the study, the modulation transfer function of an amorphous silicon (aSi) sensor array is measured by using Edge Spread Function (ESF) Technique which is extracting a profile from the linearised image of the sharp edge. The Platinum foil is used to determine the ESF. The detector under study was a 2,304 (h) x 3,200 (v) total pixel matrix, 127 μm2 pixel pitch, 57% fill factor and using Gd2O2S:Tb Kodak Lanex Regular as the conversion screen. The ESF measurement is done by using 75 - 100 kV range of x-ray with constant mA. (Author)

  10. Generation of correlated photons in hydrogenated amorphous-silicon waveguides

    OpenAIRE

    Clemmen, S.; Perret, A; Selvaraja, Shankar Kumar; Bogaerts, Wim; Van Thourhout, Dries; Baets, Roel; Emplit, Ph.; Massar, S.

    2011-01-01

    We report the first (to our knowledge) observation of correlated photon emission in hydrogenated amorphous- silicon waveguides. We compare this to photon generation in crystalline silicon waveguides with the same geome- try. In particular, we show that amorphous silicon has a higher nonlinearity and competes with crystalline silicon in spite of higher loss.

  11. Structural relaxation in amorphous silicon carbide

    International Nuclear Information System (INIS)

    High purity single crystal and chemically vapor deposited (CVD) silicon carbide have been amorphized under fast neutron irradiation. The gradual transition in physical properties from the as-amorphized state to a more relaxed amorphous state prior to crystallization is studied. For the three bulk properties studied: density, electrical resistivity, and thermal conductivity, large property changes occur upon annealing between the amorphization temperature and the point of crystallization. These physical property changes occur in the absence of crystallization and are attributed to short and perhaps medium range ordering during annealing. It is demonstrated that the physical properties of amorphous SiC (a-SiC) can vary greatly and are likely a function of the irradiation state producing the amorphization. The initiation of crystallization as measured using bulk density and in situ TEM is found to be ∼875 deg. C, though the kinetics of crystallization above this point are seen to depend on the technique used. It is speculated that in situ TEM and other thin-film approaches to study crystallization of amorphous SiC are flawed due to thin-film effects

  12. Ion bombardment and disorder in amorphous silicon

    International Nuclear Information System (INIS)

    The effect of ion bombardment during growth on the structural and optical properties of amorphous silicon are presented. Two series of films were deposited under electrically grounded and positively biased substrate conditions. The biased samples displayed lower growth rates and increased hydrogen content relative to grounded counterparts. The film structure was examined using Raman spectroscopy. The transverse optic like phonon band position was used as a parameter to characterize network order. Biased samples displayed an increased order of the amorphous network relative to grounded samples. Furthermore, biased samples exhibited a larger optical gap. These results are correlated and attributed to reduced ion bombardment effects

  13. Investigations on silicon/amorphous-carbon and silicon/nanocrystalline palladium/ amorphous-carbon interfaces.

    Science.gov (United States)

    Roy, M; Sengupta, P; Tyagi, A K; Kale, G B

    2008-08-01

    Our previous work revealed that significant enhancement in sp3-carbon content of amorphous carbon films could be achieved when grown on nanocrystalline palladium interlayer as compared to those grown on bare silicon substrates. To find out why, the nature of interface formed in both the cases has been investigated using Electron Probe Micro Analysis (EPMA) technique. It has been found that a reactive interface in the form of silicon carbide and/silicon oxy-carbide is formed at the interface of silicon/amorphous-carbon films, while palladium remains primarily in its native form at the interface of nanocrystalline palladium/amorphous-carbon films. However, there can be traces of dissolved oxygen within the metallic layer as well. The study has been corroborated further from X-ray photoelectron spectroscopic studies. PMID:19049221

  14. PHYSICAL PROPERTIES OF AMORPHOUS CVD SILICON

    OpenAIRE

    Hirose, M.

    1981-01-01

    Amorphous silicon produced from the chemical vapor decomposition of silane at ~600 °C offers a pure silicon network containing no bonded-hydrogen and involving native defects of the order of 1 x 1019 cm-3. Doped phosphorus or boron atoms in the CVD a-Si interact with the defects to reduce the gap states and the spin density as well. The mechanism of the defect compensation has been interpreted in terms of complex-defect formation through the reaction between three-fold dopant atoms and divaca...

  15. Self-Diffusion in Amorphous Silicon

    Science.gov (United States)

    Strauß, Florian; Dörrer, Lars; Geue, Thomas; Stahn, Jochen; Koutsioubas, Alexandros; Mattauch, Stefan; Schmidt, Harald

    2016-01-01

    The present Letter reports on self-diffusion in amorphous silicon. Experiments were done on 29Si/natSi heterostructures using neutron reflectometry and secondary ion mass spectrometry. The diffusivities follow the Arrhenius law in the temperature range between 550 and 700 °C with an activation energy of (4.4 ±0.3 ) eV . In comparison with single crystalline silicon the diffusivities are tremendously higher by 5 orders of magnitude at about 700 °C , which can be interpreted as the consequence of a high diffusion entropy.

  16. The Local Structure of Amorphous Silicon

    Science.gov (United States)

    Treacy, M. M. J.; Borisenko, K. B.

    2012-02-01

    It is widely believed that the continuous random network (CRN) model represents the structural topology of amorphous silicon. The key evidence is that the model can reproduce well experimental reduced density functions (RDFs) obtained by diffraction. By using a combination of electron diffraction and fluctuation electron microscopy (FEM) variance data as experimental constraints in a structural relaxation procedure, we show that the CRN is not unique in matching the experimental RDF. We find that inhomogeneous paracrystalline structures containing local cubic ordering at the 10 to 20 angstrom length scale are also fully consistent with the RDF data. Crucially, they also matched the FEM variance data, unlike the CRN model. The paracrystalline model has implications for understanding phase transformation processes in various materials that extend beyond amorphous silicon.

  17. Amorphous metallic films in silicon metallization systems

    Science.gov (United States)

    So, F.; Kolawa, E.; Nicolet, M. A.

    1985-01-01

    Diffusion barrier research was focussed on lowering the chemical reactivity of amorphous thin films on silicon. An additional area of concern is the reaction with metal overlays such as aluminum, silver, and gold. Gold was included to allow for technology transfer to gallium arsenide PV cells. Amorphous tungsten nitride films have shown much promise. Stability to annealing temperatures of 700, 800, and 550 C were achieved for overlays of silver, gold, and aluminum, respectively. The lower results for aluminum were not surprising because there is an eutectic that can form at a lower temperature. It seems that titanium and zirconium will remove the nitrogen from a tungsten nitride amorphous film and render it unstable. Other variables of research interest were substrate bias and base pressure during sputtering.

  18. Amorphous silicon for thin-film transistors

    OpenAIRE

    Schropp, Rudolf Emmanuel Isidore

    1987-01-01

    Hydrogenated amorphous silicon (a-Si:H) has considerable potential as a semiconducting material for large-area photoelectric and photovoltaic applications. Moreover, a-Si:H thin-film transistors (TFT’s) are very well suited as switching devices in addressable liquid crystal display panels and addressable image sensor arrays, due to a new technology of low-cost, Iow-temperature processing overlarge areas. ... Zie: Abstract

  19. Transverse and longitudinal vibrations in amorphous silicon

    OpenAIRE

    Beltukov, Y. M.; De Fusco, C; Tanguy, A.; Parshin, D. A.

    2015-01-01

    We show that harmonic vibrations in amorphous silicon can be decomposed to transverse and longitudinal components in all frequency range even in the absence of the well defined wave vector ${\\bf q}$. For this purpose we define the transverse component of the eigenvector with given $\\omega$ as a component, which does not change the volumes of Voronoi cells around atoms. The longitudinal component is the remaining orthogonal component. We have found the longitudinal and transverse components of...

  20. Diamond and silicon pixel detectors in high radiation environments

    Energy Technology Data Exchange (ETDEWEB)

    Tsung, Jieh-Wen

    2012-10-15

    Diamond pixel detector is a promising candidate for tracking of collider experiments because of the good radiation tolerance of diamond. The diamond pixel detector must withstand the radiation damage from 10{sup 16} particles per cm{sup 2}, which is the expected total fluence in High Luminosity Large Hadron Collider. The performance of diamond and silicon pixel detectors are evaluated in this research in terms of the signal-to-noise ratio (SNR). Single-crystal diamond pixel detectors with the most recent readout chip ATLAS FE-I4 are produced and characterized. Based on the results of the measurement, the SNR of diamond pixel detector is evaluated as a function of radiation fluence, and compared to that of planar-silicon ones. The deterioration of signal due to radiation damage is formulated using the mean free path of charge carriers in the sensor. The noise from the pixel readout circuit is simulated and calculated with leakage current and input capacitance to the amplifier as important parameters. The measured SNR shows good agreement with the calculated and simulated results, proving that the performance of diamond pixel detectors can exceed the silicon ones if the particle fluence is more than 10{sup 15} particles per cm{sup 2}.

  1. Amorphous silicon carbide films prepared using vaporized silicon ink

    Science.gov (United States)

    Masuda, Takashi; Shen, Zhongrong; Takagishi, Hideyuki; Ohdaira, Keisuke; Shimoda, Tatsuya

    2014-03-01

    The deposition of wide-band-gap silicon films using nonvacuum processes rather than conventional vacuum processes is of substantial interest because it may reduce cost. Herein, we present the optical and electrical properties of p-type hydrogenated amorphous silicon carbide (a-SiC:H) films prepared using a nonvacuum process in a simple chamber with a vaporized silicon ink consisting of cyclopentasilane, cyclohexene, and decaborane. The incorporation of carbon into the silicon network induced by the addition of cyclohexene to the silicon ink resulted in an increase in the optical band gap (Eg) of films from 1.56 to 2.11 eV. The conductivity of films with Eg 1.9 eV show lower conductivity than expected because of the incorporation of excess carbon without the formation of Si-C bonds.

  2. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    NARCIS (Netherlands)

    Khan, R.U.A.; Silva, S.R.P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p

  3. Nickel-induced crystallization of amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Schmidt, J A; Arce, R D; Buitrago, R H [INTEC (CONICET-UNL), Gueemes 3450, S3000GLN Santa Fe (Argentina); Budini, N; Rinaldi, P, E-mail: jschmidt@intec.unl.edu.a [FIQ - UNL, Santiago del Estero 2829, S3000AOM Santa Fe (Argentina)

    2009-05-01

    The nickel-induced crystallization of hydrogenated amorphous silicon (a-Si:H) is used to obtain large grained polycrystalline silicon thin films on glass substrates. a-Si:H is deposited by plasma enhanced chemical vapour deposition at 200 deg. C, preparing intrinsic and slightly p-doped samples. Each sample was divided in several pieces, over which increasing Ni concentrations were sputtered. Two crystallization methods are compared, conventional furnace annealing (CFA) and rapid thermal annealing (RTA). The crystallization was followed by optical microscopy and scanning electron microscopy observations, X-ray diffraction, and reflectance measurements in the UV region. The large grain sizes obtained - larger than 100{mu}m for the samples crystallized by CFA - are very encouraging for the preparation of low-cost thin film polycrystalline silicon solar cells.

  4. Modelling the light induced metastable effects in amorphous silicon

    OpenAIRE

    Munyeme, G.; Chinyama, G.K.; Zeman, M.; R. E. I. Schropp; Weg, W

    2008-01-01

    We present results of computer simulations of the light induced degradation of amorphous silicon solar cells. It is now well established that when amorphous silicon is illuminated the density of dangling bond states increases. Dangling bond states produce amphoteric electronic mid-gap states which act as efficient charge trapping and recombination centres. The increase in dangling bond states causes a decrease in the performance of amorphous silicon solar cells. To show this effect, a modelli...

  5. Amorphous silicon sensor arrays for X-ray and document imaging

    International Nuclear Information System (INIS)

    Large area amorphous silicon image sensor arrays are important for X-ray medical imaging and document scanning as well as a variety of other applications where large sensor size is required. The paper first summarizes the present state of the flat panel X-ray imager technology, and compares the two main approaches for X-ray detection. The authors then describe the performance of a new, large area, high resolution, radiographic imager based o a single amorphous silicon array with 2,304 x 3,200 pixels, and an active area of 30 x 40 cm (12 x 16 inches)

  6. Study of Silicon Pixel Sensors for Synchrotron Radiation Detection

    CERN Document Server

    Li, Zhen-Jie; Hu, Ling-Fei; Liu, Peng; Yin, Hua-Xiang

    2015-01-01

    Hybrid pixel single-photon-counting detectors have been successfully employed and widely used in Synchrotron radiation X-ray detection. In this paper, the silicon pixel sensors for single X-ray photon detection, which operate in full-depletion mode have been studied. The pixel sensors were fabricated on 4-inch, N type, 320{\\mu}m thick, high-resistivity silicon wafers. The pixel sensors has a p+-in-n structure with varies of pixel size and gap size including guard-ring structures. Later, the pixel sensor was wire bonded to the ASIC circuits and tested for the performance of X-ray response in the synchrotron beam line (BSRF, 1W2B). From the S-curve scan, we could get the energy resolution and the linear properties between input energy and the equivalent generator amplitude. The pixel sensors we fabricated have a good energy linear and high count rate depending on the ASIC readout circuit. We get the 20% energy resolution above 10 keV photon energy via wire bonding. The energy resolution would get better if we b...

  7. Characterization of 36 pixel silicon PAD detectors

    International Nuclear Information System (INIS)

    As silicon detectors offer good energy resolution and high reliability, these are ideally suited for tracking and calorimetric applications in nuclear and particle physics experiments. The band gap of silicon is small enough to produce a good number of charge carriers per unit energy loss of the ionizing particles. Further, the high material density (2.33 g/cm3) leads to a large energy loss per traversed length for ionizing particle (3.8 MeV/cm for a minimum ionizing particle). The semiconductor fabrication technology is now mature enough to produce low leakage and fast response detectors, as the mobility degradation is minimum due to doping

  8. The Level 0 Pixel Trigger System for the ALICE Silicon Pixel Detector: implementation, testing and commissioning

    CERN Document Server

    Aglieri-Rinella, G

    2008-01-01

    The ALICE Silicon Pixel Detector transmits 1200 Fast-OR signals every 100 ns on 120 optical readout channels. They indicate the presence of at least one hit in the pixel matrix of each readout chip. The ALICE Level 0 Pixel Trigger System extracts them, processes them and delivers an input signal to the Central Trigger Processor for the first level trigger decision within a latency of 800 ns. This paper describes tests and measurements made on the system during the qualification and commissioning phases. These included Bit Error Rate tests on the Fast-OR data path, the measurement of the overall process latency and the recording of calibration data with cosmic rays. The first results of the operation of the Pixel Trigger System with the SPD detector in the ALICE experiment are also presented.

  9. Three-Terminal Amorphous Silicon Solar Cells

    OpenAIRE

    Cheng-Hung Tai; Chu-Hsuan Lin; Chih-Ming Wang; Chun-Chieh Lin

    2011-01-01

    Many defects exist within amorphous silicon since it is not crystalline. This provides recombination centers, thus reducing the efficiency of a typical a-Si solar cell. A new structure is presented in this paper: a three-terminal a-Si solar cell. The new back-to-back p-i-n/n-i-p structure increased the average electric field in a solar cell. A typical a-Si p-i-n solar cell was also simulated for comparison using the same thickness and material parameters. The 0.28 μm-thick three-terminal a-Si...

  10. Radiation resistance studies of amorphous silicon films

    Science.gov (United States)

    Woodyard, James R.; Payson, J. Scott

    1989-01-01

    Hydrogenated amorphous silicon thin films were irradiated with 2.00 MeV helium ions using fluences ranging from 1E11 to 1E15 cm(-2). The films were characterized using photothermal deflection spectroscopy and photoconductivity measurements. The investigations show that the radiation introduces sub-band-gap states 1.35 eV below the conduction band and the states increase supralinearly with fluence. Photoconductivity measurements suggest the density of states above the Fermi energy is not changing drastically with fluence.

  11. Amorphous silicon oxide window layers for high-efficiency silicon heterojunction solar cells

    OpenAIRE

    Seif, Johannes Peter; Descoeudres, Antoine; Filipic, Miha; Smole, Franc; Topic, Marko; Holman, Zachary Charles; De Wolf, Stefaan; Ballif, Christophe

    2014-01-01

    In amorphous/crystalline silicon heterojunction solar cells, optical losses can be mitigated by replacing the amorphous silicon films by wider bandgap amorphous silicon oxide layers. In this article, we use stacks of intrinsic amorphous silicon and amorphous silicon oxide as front intrinsic buffer layers and show that this increases the short-circuit current density by up to 0.43 mA/cm2 due to less reflection and a higher transparency at short wavelengths. Additionally, high open-circuit volt...

  12. Amorphous silicon-based microchannel plates

    International Nuclear Information System (INIS)

    Microchannel plates (MCP) based on hydrogenated amorphous silicon (a-Si:H) were recently introduced to overcome some of the limitations of crystalline silicon and glass MCP. The typical thickness of a-Si:H based MCPs (AMCP) ranges between 80 and 100 μm and the micromachining of the channels is realized by deep reactive ion etching (DRIE). Advantages and issues regarding the fabrication process are presented and discussed. Electron amplification is demonstrated and analyzed using Electron Beam Induced Current (EBIC) technique. The gain increases as a function of the bias voltage, limited to −340 V on account of high leakage currents across the structure. EBIC maps on 10° tilted samples confirm that the device active area extend to the entire channel opening. AMCP characterization with the electron beam shows gain saturation and signal quenching which depends on the effectiveness of the charge replenishment in the channel walls.

  13. Amorphous silicon-based microchannel plates

    Energy Technology Data Exchange (ETDEWEB)

    Franco, Andrea, E-mail: andrea.franco@epfl.ch [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland); Riesen, Yannick; Wyrsch, Nicolas; Dunand, Sylvain [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland); Powolny, Francois; Jarron, Pierre [European Organization for Nuclear Research (CERN), CH-1211 Geneva 23 (Switzerland); Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland)

    2012-12-11

    Microchannel plates (MCP) based on hydrogenated amorphous silicon (a-Si:H) were recently introduced to overcome some of the limitations of crystalline silicon and glass MCP. The typical thickness of a-Si:H based MCPs (AMCP) ranges between 80 and 100 {mu}m and the micromachining of the channels is realized by deep reactive ion etching (DRIE). Advantages and issues regarding the fabrication process are presented and discussed. Electron amplification is demonstrated and analyzed using Electron Beam Induced Current (EBIC) technique. The gain increases as a function of the bias voltage, limited to -340 V on account of high leakage currents across the structure. EBIC maps on 10 Degree-Sign tilted samples confirm that the device active area extend to the entire channel opening. AMCP characterization with the electron beam shows gain saturation and signal quenching which depends on the effectiveness of the charge replenishment in the channel walls.

  14. Substrate and Passivation Techniques for Flexible Amorphous Silicon-Based X-ray Detectors

    Directory of Open Access Journals (Sweden)

    Michael A. Marrs

    2016-07-01

    Full Text Available Flexible active matrix display technology has been adapted to create new flexible photo-sensing electronic devices, including flexible X-ray detectors. Monolithic integration of amorphous silicon (a-Si PIN photodiodes on a flexible substrate poses significant challenges associated with the intrinsic film stress of amorphous silicon. This paper examines how altering device structuring and diode passivation layers can greatly improve the electrical performance and the mechanical reliability of the device, thereby eliminating one of the major weaknesses of a-Si PIN diodes in comparison to alternative photodetector technology, such as organic bulk heterojunction photodiodes and amorphous selenium. A dark current of 0.5 pA/mm2 and photodiode quantum efficiency of 74% are possible with a pixelated diode structure with a silicon nitride/SU-8 bilayer passivation structure on a 20 µm-thick polyimide substrate.

  15. Substrate and Passivation Techniques for Flexible Amorphous Silicon-Based X-ray Detectors.

    Science.gov (United States)

    Marrs, Michael A; Raupp, Gregory B

    2016-01-01

    Flexible active matrix display technology has been adapted to create new flexible photo-sensing electronic devices, including flexible X-ray detectors. Monolithic integration of amorphous silicon (a-Si) PIN photodiodes on a flexible substrate poses significant challenges associated with the intrinsic film stress of amorphous silicon. This paper examines how altering device structuring and diode passivation layers can greatly improve the electrical performance and the mechanical reliability of the device, thereby eliminating one of the major weaknesses of a-Si PIN diodes in comparison to alternative photodetector technology, such as organic bulk heterojunction photodiodes and amorphous selenium. A dark current of 0.5 pA/mm² and photodiode quantum efficiency of 74% are possible with a pixelated diode structure with a silicon nitride/SU-8 bilayer passivation structure on a 20 µm-thick polyimide substrate. PMID:27472329

  16. Endurance Tests Of Amorphous-Silicon Photovoltaic Modules

    Science.gov (United States)

    Ross, Ronald G., Jr.; Sugimura, Russell S.

    1989-01-01

    Failure mechanisms in high-power service studied. Report discusses factors affecting endurance of amorphous-silicon solar cells. Based on field tests and accelerated aging of photovoltaic modules. Concludes that aggressive research needed if amorphous-silicon modules to attain 10-year life - value U.S. Department of Energy established as goal for photovoltaic modules in commercial energy-generating plants.

  17. Modelling the light induced metastable effects in amorphous silicon

    NARCIS (Netherlands)

    Munyeme, G.; Chinyama, G.K.; Zeman, M.; Schropp, R.E.I.; van der Weg, W.

    2008-01-01

    We present results of computer simulations of the light induced degradation of amorphous silicon solar cells. It is now well established that when amorphous silicon is illuminated the density of dangling bond states increases. Dangling bond states produce amphoteric electronic mid-gap states which a

  18. Silicon Pixel Detectors for Synchrotron Applications

    CERN Document Server

    Stewart, Graeme Douglas

    Recent advances in particle accelerators have increased the demands being placed on detectors. Novel detector designs are being implemented in many different areas including, for example, high luminosity experiments at the LHC or at next generation synchrotrons. The purpose of this thesis was to characterise some of these novel detectors. The first of the new detector types is called a 3D detector. This design was first proposed by Parker, Kenney and Segal (1997). In this design, doped electrodes are created that extend through the silicon substrate. When compared to a traditional photodiode with electrodes on the opposing surfaces, the 3D design can combine a reasonable detector thickness with a small electrode spacing resulting in fast charge collection and limited charge sharing. The small electrode spacing leads to the detectors having lower depletion voltages. This, combined with the fast collection time, makes 3D detectors a candidate for radiation hard applications. These applications include the upgra...

  19. An infrared and luminescence study of tritiated amorphous silicon

    International Nuclear Information System (INIS)

    Tritium has been incorporated into amorphous silicon. Infrared spectroscopy shows new infrared vibration modes due to silicon-tritium (Si-T) bonds in the amorphous silicon network. Si-T vibration frequencies are related to Si-H vibration frequencies by simple mass relationships. Inelastic collisions of β particles, produced as a result of tritium decay, with the amorphous silicon network results in the generation of electron-hole pairs. Radiative recombination of these carriers is observed. Dangling bonds associated with the tritium decay reduce luminescence efficiency

  20. A STUDY OF TIN IMPURITY ATOMS IN AMORPHOUS SILICON

    OpenAIRE

    Rabchanova, Tatiana

    2013-01-01

    Using the Mössbauer spectroscopy method for the 119 Sn isotope the state of tin impurity atoms in amorphous a-Si silicon is studied. The electrical and optical properties of tin doped films of thermally spray-coated amorphous silicon have been studied. It is shown that in contrast to the crystalline silicon where tin is an electrically inactive substitution impurity, in vacuum deposited amorphous silicon it produces an acceptor band near the valence band and a fraction of the tin atoms become...

  1. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    International Nuclear Information System (INIS)

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer

  2. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu; Holman, Zachary C. [School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, Arizona 85287-5706 (United States)

    2015-08-14

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer.

  3. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    Science.gov (United States)

    Boccard, Mathieu; Holman, Zachary C.

    2015-08-01

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer.

  4. The ALICE Silicon Pixel Detector Control and Calibration Systems

    CERN Document Server

    Calì, Ivan Amos; Manzari, Vito; Stefanini, Giorgio

    2008-01-01

    The work presented in this thesis was carried out in the Silicon Pixel Detector (SPD) group of the ALICE experiment at the Large Hadron Collider (LHC). The SPD is the innermost part (two cylindrical layers of silicon pixel detec- tors) of the ALICE Inner Tracking System (ITS). During the last three years I have been strongly involved in the SPD hardware and software development, construction and commissioning. This thesis is focused on the design, development and commissioning of the SPD Control and Calibration Systems. I started this project from scratch. After a prototyping phase now a stable version of the control and calibration systems is operative. These systems allowed the detector sectors and half-barrels test, integration and commissioning as well as the SPD commissioning in the experiment. The integration of the systems with the ALICE Experiment Control System (ECS), DAQ and Trigger system has been accomplished and the SPD participated in the experimental December 2007 commissioning run. The complex...

  5. Dynamics of hydrogen in hydrogenated amorphous silicon

    Indian Academy of Sciences (India)

    Ranber Singh; S Prakash

    2003-07-01

    The problem of hydrogen diffusion in hydrogenated amorphous silicon (a-Si:H) is studied semiclassically. It is found that the local hydrogen concentration fluctuations-induced extra potential wells, if intense enough, lead to the localized electronic states in a-Si:H. These localized states are metastable. The trapping of electrons and holes in these states leads to the electrical degradation of the material. These states also act as recombination centers for photo-generated carriers (electrons and holes) which in turn may excite a hydrogen atom from a nearby Si–H bond and breaks the weak (strained) Si–Si bond thereby apparently enhancing the hydrogen diffusion and increasing the light-induced dangling bonds.

  6. Three-Terminal Amorphous Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Cheng-Hung Tai

    2011-01-01

    Full Text Available Many defects exist within amorphous silicon since it is not crystalline. This provides recombination centers, thus reducing the efficiency of a typical a-Si solar cell. A new structure is presented in this paper: a three-terminal a-Si solar cell. The new back-to-back p-i-n/n-i-p structure increased the average electric field in a solar cell. A typical a-Si p-i-n solar cell was also simulated for comparison using the same thickness and material parameters. The 0.28 μm-thick three-terminal a-Si solar cell achieved an efficiency of 11.4%, while the efficiency of a typical a-Si p-i-n solar cell was 9.0%. Furthermore, an efficiency of 11.7% was achieved by thickness optimization of the three-terminal solar cell.

  7. Amorphous Silicon-Carbon Nanostructure Solar Cells

    Science.gov (United States)

    Schriver, Maria; Regan, Will; Loster, Matthias; Zettl, Alex

    2011-03-01

    Taking advantage of the ability to fabricate large area graphene and carbon nanotube networks (buckypaper), we produce Schottky junction solar cells using undoped hydrogenated amorphous silicon thin films and nanostructured carbon films. These films are useful as solar cell materials due their combination of optical transparency and conductance. In our cells, they behave both as a transparent conductor and as an active charge separating layer. We demonstrate a reliable photovoltaic effect in these devices with a high open circuit voltage of 390mV in buckypaper devices. We investigate the unique interface properties which result in an unusual J-V curve shape and optimize fabrication processes for improved solar conversion efficiency. These devices hold promise as a scalable solar cell made from earth abundant materials and without toxic and expensive doping processes.

  8. Short range atomic migration in amorphous silicon

    Science.gov (United States)

    Strauß, F.; Jerliu, B.; Geue, T.; Stahn, J.; Schmidt, H.

    2016-05-01

    Experiments on self-diffusion in amorphous silicon between 400 and 500 °C are presented, which were carried out by neutron reflectometry in combination with 29Si/natSi isotope multilayers. Short range diffusion is detected on a length scale of about 2 nm, while long range diffusion is absent. Diffusivities are in the order of 10-19-10-20 m2/s and decrease with increasing annealing time, reaching an undetectable low value for long annealing times. This behavior is strongly correlated to structural relaxation and can be explained as a result of point defect annihilation. Diffusivities for short annealing times of 60 s follow the Arrhenius law with an activation enthalpy of (0.74 ± 0.21) eV, which is interpreted as the activation enthalpy of Si migration.

  9. Tunable plasticity in amorphous silicon carbide films.

    Science.gov (United States)

    Matsuda, Yusuke; Kim, Namjun; King, Sean W; Bielefeld, Jeff; Stebbins, Jonathan F; Dauskardt, Reinhold H

    2013-08-28

    Plasticity plays a crucial role in the mechanical behavior of engineering materials. For instance, energy dissipation during plastic deformation is vital to the sufficient fracture resistance of engineering materials. Thus, the lack of plasticity in brittle hybrid organic-inorganic glasses (hybrid glasses) often results in a low fracture resistance and has been a significant challenge for their integration and applications. Here, we demonstrate that hydrogenated amorphous silicon carbide films, a class of hybrid glasses, can exhibit a plasticity that is even tunable by controlling their molecular structure and thereby leads to an increased and adjustable fracture resistance in the films. We decouple the plasticity contribution from the fracture resistance of the films by estimating the "work-of-fracture" using a mean-field approach, which provides some insight into a potential connection between the onset of plasticity in the films and the well-known rigidity percolation threshold. PMID:23876200

  10. Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

    OpenAIRE

    Voz Sánchez, Cristóbal; Martin, I.; Orpella, A.; Puigdollers i González, Joaquim; Vetter, M.; Alcubilla González, Ramón; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi

    2003-01-01

    In this work, we study the electronic surface passivation of crystalline silicon with intrinsic thin silicon films deposited by Catalytic CVD. The contactless method used to determine the effective surface recombination velocity was the quasi-steady-state photoconductance technique. Hydrogenated amorphous and nanocrystalline silicon films were evaluated as passivating layers on n- and p-type float zone silicon wafers. The best results were obtained with amorphous silicon films, which allowed ...

  11. ATLAS Inner Detector (Pixel Detector and Silicon Tracker)

    CERN Multimedia

    ATLAS Outreach

    2006-01-01

    To raise awareness of the basic functions of the Pixel Detector and Silicon Tracker in the ATLAS detector on the LHC at CERN. This colorful 3D animation is an excerpt from the film "ATLAS-Episode II, The Particles Strike Back." Shot with a bug's eye view of the inside of the detector. The viewer is taken on a tour of the inner workings of the detector, seeing critical pieces of the detector and hearing short explanations of how each works.

  12. Descent of the Silicon Pixel Detector (SPD) for ALICE Experiment

    CERN Multimedia

    2007-01-01

    The Silicon Pixel Detector (SPD) constitutes the two innermost layers of the ALICE Inner Tracking System (ITS) at radii of 3.9 cm and 7.6 cm, respectively. It is a fundamental element for the determination of the position of the primary vertex as well as for the measurement of the impact parameter of secondary tracks originating from the weak decays of strange, charm and beauty particles.

  13. Use of silicon pixel detectors in double electron capture experiments

    Energy Technology Data Exchange (ETDEWEB)

    Cermak, P; Stekl, I; Mamedov, F; Rukhadze, E N; Jose, J M; Cermak, J [Institute of Experimental and Applied Physics, Czech Technical University in Prague, Horska 3a/22, 12800 Prague 2 (Czech Republic); Shitov, Yu A; Rukhadze, N I; Brudanin, V B [Joint Institute for Nuclear Research, Joliot-Curie 6, 141980 Dubna, Moscow region (Russian Federation); Loaiza, P, E-mail: pavel.cermak@utef.cvut.cz [Laboratoire Souterrain de Modane, 73500 Modane (France)

    2011-01-15

    A novel experimental approach to search for double electron capture (EC/EC) is discussed in this article. R and D for a new generation EC/EC spectrometer based on silicon pixel detectors (SPDs) has been conducted since 2009 for an upgrade of the TGV experiment. SPDs built on Timepix technology with a spectroscopic readout from each individual pixel are an effective tool to detect the 2{nu}EC/EC signature of the two low energy X-rays hitting two separate pixels. The ability of SPDs to indentify {alpha}/{beta}/{gamma} particles and localize them precisely leads to effective background discrimination and thus considerable improvement of the signal-to-background ratio (S/B). A multi-SPD system, called a Silicon Pixel Telescope (SPT), is planned based on the experimental approach of the TGV calorimeter which measures thin foils of enriched EC/EC-isotope sandwiched between HPGe detectors working in coincidence mode. The sources of SPD internal background have been identified by measuring SPD radiopurity with a low-background HPGe detector as well as by long-term SPD background runs in the Modane underground laboratory (LSM, France), and results of these studies are presented.

  14. Use of silicon pixel detectors in double electron capture experiments

    Science.gov (United States)

    Cermak, P.; Stekl, I.; Shitov, Yu A.; Mamedov, F.; Rukhadze, E. N.; Jose, J. M.; Cermak, J.; Rukhadze, N. I.; Brudanin, V. B.; Loaiza, P.

    2011-01-01

    A novel experimental approach to search for double electron capture (EC/EC) is discussed in this article. R&D for a new generation EC/EC spectrometer based on silicon pixel detectors (SPDs) has been conducted since 2009 for an upgrade of the TGV experiment. SPDs built on Timepix technology with a spectroscopic readout from each individual pixel are an effective tool to detect the 2νEC/EC signature of the two low energy X-rays hitting two separate pixels. The ability of SPDs to indentify α/β/γ particles and localize them precisely leads to effective background discrimination and thus considerable improvement of the signal-to-background ratio (S/B). A multi-SPD system, called a Silicon Pixel Telescope (SPT), is planned based on the experimental approach of the TGV calorimeter which measures thin foils of enriched EC/EC-isotope sandwiched between HPGe detectors working in coincidence mode. The sources of SPD internal background have been identified by measuring SPD radiopurity with a low-background HPGe detector as well as by long-term SPD background runs in the Modane underground laboratory (LSM, France), and results of these studies are presented.

  15. GigaTracker, a Thin and Fast Silicon Pixels Tracker

    CERN Document Server

    Velghe, Bob; Bonacini, Sandro; Ceccucci, Augusto; Kaplon, Jan; Kluge, Alexander; Mapelli, Alessandro; Morel, Michel; Noël, Jérôme; Noy, Matthew; Perktold, Lukas; Petagna, Paolo; Poltorak, Karolina; Riedler, Petra; Romagnoli, Giulia; Chiozzi, Stefano; Cotta Ramusino, Angelo; Fiorini, Massimiliano; Gianoli, Alberto; Petrucci, Ferruccio; Wahl, Heinrich; Arcidiacono, Roberta; Jarron, Pierre; Marchetto, Flavio; Gil, Eduardo Cortina; Nuessle, Georg; Szilasi, Nicolas

    2014-01-01

    GigaTracker, the NA62’s upstream spectrometer, plays a key role in the kinematically constrained background suppression for the study of the K + ! p + n ̄ n decay. It is made of three independent stations, each of which is a six by three cm 2 hybrid silicon pixels detector. To meet the NA62 physics goals, GigaTracker has to address challenging requirements. The hit time resolution must be better than 200 ps while keeping the total thickness of the sensor to less than 0.5 mm silicon equivalent. The 200 μm thick sensor is divided into 18000 300 μm 300 μm pixels bump-bounded to ten independent read-out chips. The chips use an end-of-column architecture and rely on time-over- threshold discriminators. A station can handle a crossing rate of 750 MHz. Microchannel cooling technology will be used to cool the assembly. It allows us to keep the sensor close to 0 C with 130 μm of silicon in the beam area. The sensor and read-out chip performance were validated using a 45 pixel demonstrator with a laser test setu...

  16. Ion beam irradiation of relaxed amorphous silicon carbide

    International Nuclear Information System (INIS)

    In-situ transmittance measurements at λ=633 nm are used during ion irradiation to probe the defect generation in relaxed amorphous silicon carbide (SiC). The optical constants of amorphous SiC are strongly correlated to the thermal history of the material and the transmittance of ion implanted amorphous SiC (unrelaxed amorphous) increases after annealing in the temperature range 100-700 deg. C. The transmittance of annealed amorphous SiC (relaxed) during subsequent implantation decreases and saturates to the value of unrelaxed amorphous. In-situ transmittance measurements allow to follow directly the defect generation and to measure the fluence at which the transmittance saturates (derelaxation fluence). The effect of different ions (He and Ar) on these phenomena is explored. The obtained results are compared and discussed with similar measurements performed on amorphous silicon

  17. Hydrogen distribution in amorphous silicon and silicon based alloys

    International Nuclear Information System (INIS)

    The results of hydrogen evolution experiments on amorphous silicon alloys prepared by high frequency PECVD of gas mixtures containing SiH4, NH3, PH2, B2H6 are compared. Using a very low heating rate of 5 degree/min it is possible to resolve fine structure on the exodiffusion spectra. Three evolution processes are observed: (a) low temperature effusion due to included gas (b) mid temperature effusion due to 'clustered' hydrogen bonds (c) high temperature effusion due to 'isolated' hydrogen bonds In addition it is possible to oberve very fine structure 'puffing' due to the release of molecular hydrogen at mid to high temperature. Silicon and silicon nitride films have been annealed at low temperatures before the exodiffusion experiments and changes in the evolution spectra are observed, dependent on the annealing process. A scanning electron microscope study of the effect of high temperature heat treatment has also been undertaken. These results are correlated with infra-red absorption measurements and the influence of doping concentration and substrate character discussed. Under certain preparation conditions the films blister on heating and finally burst forming circular craters, and these effects are shown to be dependent on substrate material and intrinsic stress of the as-grown films

  18. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon.

    Science.gov (United States)

    Ben Slama, Sonia; Hajji, Messaoud; Ezzaouia, Hatem

    2012-01-01

    Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under vacuum at 750°C. Obtained results from structural, optical, and electrical characterizations show that thermal annealing of amorphous silicon deposited on Ni-metalized porous silicon leads to an enhancement in the crystalline quality and physical properties of the silicon thin films. The improvement in the quality of the film is due to the crystallization of the amorphous film during annealing. This simple and easy method can be used to produce silicon thin films with high quality suitable for thin film solar cell applications. PMID:22901341

  19. Proton NMR studies of PECVD hydrogenated amorphous silicon films and HWCVD hydrogenated amorphous silicon films

    Science.gov (United States)

    Herberg, Julie Lynn

    This dissertation discusses a new understanding of the internal structure of hydrogenated amorphous silicon. Recent research in our group has included nuclear spin echo double resonance (SEDOR) measurements on device quality hydrogenated amorphous silicon photovoltaic films. Using the SEDOR pulse sequence with and without the perturbing 29Si pulse, we obtain Fourier transform spectra for film at 80K that allows us to distinguish between molecular hydrogen and hydrogen bonded to silicon. Using such an approach, we have demonstrated that high quality a-Si:H films produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) from SiH 4 contains about ten atomic percent hydrogen, nearly 40% of which is molecular hydrogen, individually trapped in the amorphous equivalent of tetragonal sites (T-sites). The main objective of this dissertation is to examine the difference between a-Si:H made by PECVD techniques and a-Si:H made by Hot Wire Chemical Vapor Deposition (HWCVD) techniques. Proton NMR and 1H- 29Si SEDOR NMR are used to examine the hydrogen structure of HWCVD a-Si:H films prepared at the University of Utrecht and at the National Renewable Energy Laboratory (NREL). Past NMR studies have shown that high quality PECVD a-Si:H films have geometries in which 40% of the contained hydrogen is present as H2 molecules individually trapped in the amorphous equivalent of T-sites. A much smaller H2 fraction sometimes is physisorbed on internal surfaces. In this dissertation, similar NMR methods are used to perform structural studies of the two HWCVD aSi:H samples. The 3kHz resonance line from T-site-trapped H2 molecules shows a hole-burn behavior similar to that found for PECVD a-Si:H films as does the 24kHz FWHM line from clustered hydrogen bonded to silicon. Radio frequency hole-burning is a tool to distinguish between inhomogenous and homogeneous broadening. In the hole-burn experiments, the 3kHz FWHM resonance line from T-site-trapped H2 molecules shows a hole

  20. Detector performance of the ALICE silicon pixel detector

    CERN Document Server

    Cavicchioli, C

    2011-01-01

    The ALICE Silicon Pixel Detector (SPD) forms the two innermost layers of the ALICE Inner Tracking System (ITS). It consists of two barrel layers of hybrid silicon pixel detectors at radii of 39 and 76 mm. The physics targets of the ALICE experiment require that the material budget of the SPD is kept within approximate to 1\\%X(0) per layer. This has set some stringent constraints on the design and construction of the SPD. A unique feature of the ALICE SPD is that it is capable of providing a prompt trigger signal, called Fast-OR, which contributes to the L0 trigger decision. The pixel trigger system allows to apply a set of algorithms for the trigger selection, and its output is sent to the Central Trigger Processor (CTP). The detector has been installed in the experiment in summer 2007. During the first injection tests in June 2008 the SPD was able to record the very first sign of life of the LHC by registering secondary particles from the beam dumped upstream the ALICE experiment. In the following months the...

  1. Laser annealing of amorphous silicon core optical fibers

    OpenAIRE

    Healy, N; Mailis, S.; Day, T. D.; Sazio, P.J.A.; Badding, J. V.; A.C. Peacock

    2012-01-01

    Laser annealing of an optical fiber with an amorphous silicon core is demonstrated. The annealing process produces a fiber that has a highly crystalline core, whilst reducing the optical transmission losses by ~3 orders of magnitude.

  2. Nanocavity Shrinkage and Preferential Amorphization during Irradiation in Silicon

    Institute of Scientific and Technical Information of China (English)

    ZHU Xian-Fang; WANG Zhan-Guo

    2005-01-01

    @@ We model the recent experimental results and demonstrate that the internal shrinkage of nanocavities in silicon is intrinsically associated with preferential amorphization as induced by self-ion irradiation.

  3. Thermal properties of amorphous/crystalline silicon superlattices.

    Science.gov (United States)

    France-Lanord, Arthur; Merabia, Samy; Albaret, Tristan; Lacroix, David; Termentzidis, Konstantinos

    2014-09-01

    Thermal transport properties of crystalline/amorphous silicon superlattices using molecular dynamics are investigated. We show that the cross-plane conductivity of the superlattices is very low and close to the conductivity of bulk amorphous silicon even for amorphous layers as thin as ≃ 6 Å. The cross-plane thermal conductivity weakly increases with temperature which is associated with a decrease of the Kapitza resistance with temperature at the crystalline/amorphous interface. This property is further investigated considering the spatial analysis of the phonon density of states in domains close to the interface. Interestingly, the crystalline/amorphous superlattices are shown to display large thermal anisotropy, according to the characteristic sizes of elaborated structures. These last results suggest that the thermal conductivity of crystalline/amorphous superlattices can be phonon engineered, providing new directions for nanostructured thermoelectrics and anisotropic materials in thermal transport. PMID:25105883

  4. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon

    OpenAIRE

    Ben Slama, Sonia; Hajji, Messaoud; Ezzaouia, Hatem

    2012-01-01

    Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under vacuum at 750°C. Obtained results from structural, optical, and electrical characterizations show that...

  5. Structure and Optical Properties of Silicon Nanocrystals Embedded in Amorphous Silicon Thin Films Obtained by PECVD

    OpenAIRE

    Monroy, B. M.; Aduljay Remolina Millán; García-Sánchez, M. F.; Ponce, A.; Picquart, M.; Santana, G.

    2011-01-01

    Silicon nanocrystals embedded in amorphous silicon matrix were obtained by plasma enhanced chemical vapor deposition using dichlorosilane as silicon precursor. The RF power and dichlorosilane to hydrogen flow rate ratio were varied to obtain different crystalline fractions and average sizes of silicon nanocrystals. High-resolution transmission electron microscopy images and RAMAN measurements confirmed the existence of nanocrystals embedded in the amorphous matrix with average sizes between 2...

  6. Interaction of hydrogenated amorphous silicon films with transparent conductive films

    OpenAIRE

    Kitagawa, M.; Mori, K; Ishihara, S.; Ohno, M.; Hirao, T.; Yoshioka, Y.; Kohiki, S

    1983-01-01

    The effects of the deposition temperature on the interaction of the hydrogenated amorphous silicon films with indium-tin-oxide and tin-oxide films have been investigated in the temperature range 150-300 degrees C, using Auger electron spectroscopy, secondary ion mass spectrometry, and scanning electron microscopy. It was found that the constituent atoms such as indium and tin are detected in the thin amorphous silicon films deposited. Around the interface between the transparent conductive fi...

  7. PHOTOEMISSION STUDIES OF THE TRANSITION FROM AMORPHOUS TO MICROCRYSTALLINE SILICON

    OpenAIRE

    Richter, H.; Ley, L.

    1981-01-01

    We have studied a series of samples spanning the range from purely amorphous to microcrystalline silicon prepared by chemical transport in a hydrogen plasma or by sputtering in a H2/Ar mixture. The first order Raman spectra show a superposition of amorphous and crystalline contribution, showing some features of wurtzite-silicon. The electronic density of states, as deduced from X-ray photoelectron-spectroscopy, shows a gradual change from microcrystalline structure for samples prepared by che...

  8. Experimentally Constrained Molecular Relaxation: The case of hydrogenated amorphous silicon

    OpenAIRE

    Biswas, Parthapratim; Atta-Fynn, Raymond; Drabold, David A.

    2007-01-01

    We have extended our experimentally constrained molecular relaxation technique (P. Biswas {\\it et al}, Phys. Rev. B {\\bf 71} 54204 (2005)) to hydrogenated amorphous silicon: a 540-atom model with 7.4 % hydrogen and a 611-atom model with 22 % hydrogen were constructed. Starting from a random configuration, using physically relevant constraints, {\\it ab initio} interactions and the experimental static structure factor, we construct realistic models of hydrogenated amorphous silicon. Our models ...

  9. Edge pixel response studies of edgeless silicon sensor technology for pixellated imaging detectors

    Science.gov (United States)

    Maneuski, D.; Bates, R.; Blue, A.; Buttar, C.; Doonan, K.; Eklund, L.; Gimenez, E. N.; Hynds, D.; Kachkanov, S.; Kalliopuska, J.; McMullen, T.; O'Shea, V.; Tartoni, N.; Plackett, R.; Vahanen, S.; Wraight, K.

    2015-03-01

    Silicon sensor technologies with reduced dead area at the sensor's perimeter are under development at a number of institutes. Several fabrication methods for sensors which are sensitive close to the physical edge of the device are under investigation utilising techniques such as active-edges, passivated edges and current-terminating rings. Such technologies offer the goal of a seamlessly tiled detection surface with minimum dead space between the individual modules. In order to quantify the performance of different geometries and different bulk and implant types, characterisation of several sensors fabricated using active-edge technology were performed at the B16 beam line of the Diamond Light Source. The sensors were fabricated by VTT and bump-bonded to Timepix ROICs. They were 100 and 200 μ m thick sensors, with the last pixel-to-edge distance of either 50 or 100 μ m. The sensors were fabricated as either n-on-n or n-on-p type devices. Using 15 keV monochromatic X-rays with a beam spot of 2.5 μ m, the performance at the outer edge and corners pixels of the sensors was evaluated at three bias voltages. The results indicate a significant change in the charge collection properties between the edge and 5th (up to 275 μ m) from edge pixel for the 200 μ m thick n-on-n sensor. The edge pixel performance of the 100 μ m thick n-on-p sensors is affected only for the last two pixels (up to 110 μ m) subject to biasing conditions. Imaging characteristics of all sensor types investigated are stable over time and the non-uniformities can be minimised by flat-field corrections. The results from the synchrotron tests combined with lab measurements are presented along with an explanation of the observed effects.

  10. Amorphous Silicon: Flexible Backplane and Display Application

    Science.gov (United States)

    Sarma, Kalluri R.

    Advances in the science and technology of hydrogenated amorphous silicon (a-Si:H, also referred to as a-Si) and the associated devices including thin-film transistors (TFT) during the past three decades have had a profound impact on the development and commercialization of major applications such as thin-film solar cells, digital image scanners and X-ray imagers and active matrix liquid crystal displays (AMLCDs). Particularly, during approximately the past 15 years, a-Si TFT-based flat panel AMLCDs have been a huge commercial success. a-Si TFT-LCD has enabled the note book PCs, and is now rapidly replacing the venerable CRT in the desktop monitor and home TV applications. a-Si TFT-LCD is now the dominant technology in use for applications ranging from small displays such as in mobile phones to large displays such as in home TV, as well-specialized applications such as industrial and avionics displays.

  11. Anharmonic Decay of Vibrational States in Amorphous Silicon

    OpenAIRE

    Fabian, Jaroslav; Allen, Philip B.

    1996-01-01

    Anharmonic decay rates are calculated for a realistic atomic model of amorphous silicon. The results show that the vibrational states decay on picosecond timescales and follow the two-mode density of states, similar to crystalline silicon, but somewhat faster. Surprisingly little change occurs for localized states. These results disagree with a recent experiment.

  12. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    OpenAIRE

    Khan, R U A; Silva, S. R. P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p layer had to be reduced from 9 to 2.5 nm in order to ensure sufficient conduction through the PAC film. Although the resulting external parameters suggest a decrease in the device efficiency from 9...

  13. Preparation and Characterization of Amorphous Silicon Oxide Nanowires

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Large-scale amorphous silicon nanowires (SiNWs) with a diameter about 100 nm and a length of dozens of micrometers on silicon wafers were synthesized by thermal evaporation of silicon monoxide (SiO).Scanning electron microscope (SEM) and transmission electron microscope (TEM) observations show that the silicon nanowires are smooth.Selected area electron diffraction (SAED) shows that the silicon nanowires are amorphous and energy-dispersive X-ray spectroscopy (EDS) indicates that the nanowires have the composition of Si and O elements in an atomic ratio of 1:2, their composition approximates that of SiO2.SiO is considered to be used as a Si sources to produce SiNWs.We conclude that the growth mechanism is closely related to the defect structure and silicon monoxide followed by growth through an oxide-assisted vapor-solid reaction.

  14. Electrical characteristics of amorphous iron-tungsten contacts on silicon

    OpenAIRE

    Finetti, M.; Pan, E. T-S.; Suni, I.; Nicolet, M-A.

    1983-01-01

    The electrical characteristics of amorphous Fe-W contacts have been determined on both p-type and n-type silicon. The amorphous films were obtained by cosputtering from a composite target. Contact resistivities, pc=1×10^−7 and pc=2.8×10^−6, were measured on n+ and p+ silicon, respectively. These values remain constant after thermal treatment up to at least 500°C. A barrier height, φBn=0.61 V, was measured on n-type silicon.

  15. Electrical characteristics of amorphous iron-tungsten contacts on silicon

    Science.gov (United States)

    Finetti, M.; Pan, E. T.-S.; Nicolet, M.-A.; Suni, I.

    1983-01-01

    The electrical characteristics of amorphous Fe-W contacts have been determined on both p-type and n-type silicon. The amorphous films were obtained by cosputtering from a composite target. Contact resistivities of 1 x 10 to the -7th and 2.8 x 10 to the -6th were measured on n(+) and p(+) silicon, respectively. These values remain constant after thermal treatment up to at least 500 C. A barrier height of 0.61 V was measured on n-type silicon.

  16. Hydrogenated amorphous silicon deposited by ion-beam sputtering

    Science.gov (United States)

    Lowe, V. E.; Henin, N.; Tu, C.-W.; Tavakolian, H.; Sites, J. R.

    1981-01-01

    Hydrogenated amorphous silicon films 1/2 to 1 micron thick were deposited on metal and glass substrates using ion-beam sputtering techniques. The 800 eV, 2 mA/sq cm beam was a mixture of argon and hydrogen ions. The argon sputtered silicon from a pure (7.6 cm) single crystal wafer, while the hydrogen combined with the sputtered material during the deposition. Hydrogen to argon pressure ratios and substrate temperatures were varied to minimize the defect state density in the amorphous silicon. Characterization was done by electrical resistivity, index of refraction and optical absorption of the films.

  17. Growth and Characterization of Hydrogenated Amorphous Silicon and Hydrogenated Amorphous Silicon Carbide with Liquid Organometallic Sources.

    Science.gov (United States)

    Gaughan, Kevin David

    The growth and characterization of hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon -carbon (rm a-rm Si _{1-X}C_{X}: H) alloys employing liquid organometallic sources are described. N -type a-Si:H films were grown using a mixture of silane and tertiarybutylphosphine (TBP-rm C_4H _9P_2) vapor in a plasma enhanced chemical vapor deposition system. Impurity levels from parts per million to about 5 at. % phosphorus have been incorporated into the film with this method. Tertiarybutylphosphine is less toxic and less pyrophoric than phosphine which is usually used in n-type doping of a-Si:H films. Optical and electronic properties were characterized by room temperature as well as temperature dependent dark conductivity, photothermal deflection spectroscopy, infrared vibrational spectroscopy, electron spin resonance, and electron microprobe analysis. The gross doping properties of a-Si:H doped with TBP are the same as those obtained with phosphine. The experimental results are compared with the predictions of several models that describe the chemical equilibrium between active dopants and deep defects. A pronounced decrease in the effects of doping, such as an increase in the activation energy of electrical conductivity and an decrease in the conductivity of the sample, were seen in heavily doped films (TBP/SiH _4> 0.5%), perhaps influenced by the increased carbon and/or phosphorus concentrations. Amorphous silicon-carbide alloys have been grown by the plasma decomposition of ditertiarybutylsilane ( rm DTBS-rm SiH_2(C _4H_9)_2). The optical bandgaps, which varied from 2.2 to 3.3 eV, are strongly dependent upon the deposition conditions. The carbon concentrations in these films varied from 60 to 95 at. %. The optical band-edge is very broad compared to that which is found in a-Si:H and this breadth is essentially independent of the deposition conditions. The plasma decomposition of admixtures of DTBS and silane has produced rm a- rm Si_{1-X

  18. Development of silicon pixels for strangeness detection in nucleus-nucleus collisions

    Energy Technology Data Exchange (ETDEWEB)

    Antinori, F. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland)]|[Dipartimento di Fisica dell`Universita and Sezione INFN, I-16146 Genoa (Italy); Barberis, D. [Dipartimento di Fisica dell`Universita and Sezione INFN, I-16146 Genoa (Italy); Beker, H. [Dipartimento di Fisica dell`Universita ``La Sapienza`` and Sezione INFN, I-00185 Rome (Italy); Beusch, W.; Campbell, M.; Cantatore, E. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Catanesi, M.G. [Dipartimento di Fisica dell`Universita and Sezione INFN, I-70124 Bari (Italy); Chesi, E. [CERN, European Organization for Nuclear Research, CH-1211 Genova 23 (Switzerland); Darbo, G. [Dipartimento di Fisica dell`Universita and Sezione INFN, I-70124 Bari (Italy); Di Bari, D. [Dipartimento di Fisica dell`Universita and Sezione INFN, I-70124 Bari (Italy); Di Liberto, S. [Dipartimento di Fisica dell`Universita ``La Sapienza`` and Sezione INFN, I-00185 Rome (Italy); Elia, D. [Dipartimento di Fisica dell-Universita and Sezione INFN, I-70124 Bari (Italy); Heijne, E.H.M.; Helstrup, H.; Jacholkowski, A.; Klempt, W.; Knudson, K. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Kralik, I. [Institute of Experimental Physics, SK-04353 Kosice (Slovakia); Lassalle, J.C. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Lenti, V. [Dipartimento di Fisica dell`Universita and Sezione INFN, I-70124 Bari (Italy); Lopez, L. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Luptak, M. [Institute of Experimental Physics, SK-04353 Kosice (Slovakia); Martinengo, P. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Meddi, F. [Dipartimento di Fisica dell`Universita ``La Sapienza`` and Sezione INFN, I-00185 Rome (Italy); Middelkamp, P. [CERN, European Organization for Nuclear Research, CH-1211 Geneva 23 (Switzerland); Presented by...

    1995-07-20

    Silicon microdetectors and in particular the novel silicon pixel detectors open up the way for a comprehensive study of strangeness detection in nucleus-nucleus collisions. We outline the philosophy behind this approach, describe an application in the pixel-based heavy-ion experiment WA97, and give some preliminary results on the performance of four silicon pixels planes in the 1994 Pb beam run of WA97. We conclude with an outlook on some possible future applications of silicon pixels. {copyright} 1995 {ital American} {ital Institute} {ital of} {ital Physics}.

  19. Development of silicon pixels for strangeness detection in nucleus-nucleus collisions

    International Nuclear Information System (INIS)

    Silicon microdetectors and in particular the novel silicon pixel detectors open up the way for a comprehensive study of strangeness detection in nucleus-nucleus collisions. We outline the philosophy behind this approach, describe an application in the pixel-based heavy-ion experiment WA97, and give some preliminary results on the performance of four silicon pixels planes in the 1994 Pb beam run of WA97. We conclude with an outlook on some possible future applications of silicon pixels. copyright 1995 American Institute of Physics

  20. CURRENT PATH IN AMORPHOUS-SILICON FIELD EFFECT TRANSISTORS

    OpenAIRE

    M. MATSUMURA; Kuno, S.; Uchida, Y.

    1981-01-01

    On-resistance of amorphous-silicon field effect transistors with staggered electrodes was investigated. It was found that dependences of the on-resistance on geometrical parameters were classified into two groups. The origin was attributed to the residual resistance between the n+ electrode and the channel which was formed at the silicon-silicon dioxide interface. The resistance was analyzed by taking space charge effect into account, and we found that it changes in accordance with sample pre...

  1. Study of silicon pixel sensor for synchrotron radiation detection

    Science.gov (United States)

    Li, Zhen-Jie; Jia, Yun-Cong; Hu, Ling-Fei; Liu, Peng; Yin, Hua-Xiang

    2016-03-01

    The silicon pixel sensor (SPS) is one of the key components of hybrid pixel single-photon-counting detectors for synchrotron radiation X-ray detection (SRD). In this paper, the design, fabrication, and characterization of SPSs for single beam X-ray photon detection is reported. The designed pixel sensor is a p+-in-n structure with guard-ring structures operated in full-depletion mode and is fabricated on 4-inch, N type, 320 μm thick, high-resistivity silicon wafers by a general Si planar process. To achieve high energy resolution of X-rays and obtain low dark current and high breakdown voltage as well as appropriate depletion voltage of the SPS, a series of technical optimizations of device structure and fabrication process are explored. With optimized device structure and fabrication process, excellent SPS characteristics with dark current of 2 nA/cm2, full depletion voltage 150 V are achieved. The fabricated SPSs are wire bonded to ASIC circuits and tested for the performance of X-ray response to the 1W2B synchrotron beam line of the Beijing Synchrotron Radiation Facility. The measured S-curves for SRD demonstrate a high discrimination for different energy X-rays. The extracted energy resolution is high (10 keV) and the linear properties between input photo energy and the equivalent generator amplitude are well established. It confirmed that the fabricated SPSs have a good energy linearity and high count rate with the optimized technologies. The technology is expected to have a promising application in the development of a large scale SRD system for the Beijing Advanced Photon Source. Supported by Prefabrication Research of Beijing Advanced Photon Source (R&D for BAPS) and National Natural Science Foundation of China (11335010)

  2. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    OpenAIRE

    Yaser Abdulraheem; Ivan Gordon; Twan Bearda; Hosny Meddeb; Jozef Poortmans

    2014-01-01

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavel...

  3. Edge pixel response studies of edgeless silicon sensor technology for pixellated imaging detectors

    International Nuclear Information System (INIS)

    Silicon sensor technologies with reduced dead area at the sensor's perimeter are under development at a number of institutes. Several fabrication methods for sensors which are sensitive close to the physical edge of the device are under investigation utilising techniques such as active-edges, passivated edges and current-terminating rings. Such technologies offer the goal of a seamlessly tiled detection surface with minimum dead space between the individual modules. In order to quantify the performance of different geometries and different bulk and implant types, characterisation of several sensors fabricated using active-edge technology were performed at the B16 beam line of the Diamond Light Source. The sensors were fabricated by VTT and bump-bonded to Timepix ROICs. They were 100 and 200 μ m thick sensors, with the last pixel-to-edge distance of either 50 or 100 μ m. The sensors were fabricated as either n-on-n or n-on-p type devices. Using 15 keV monochromatic X-rays with a beam spot of 2.5 μ m, the performance at the outer edge and corners pixels of the sensors was evaluated at three bias voltages. The results indicate a significant change in the charge collection properties between the edge and 5th (up to 275 μ m) from edge pixel for the 200 μ m thick n-on-n sensor. The edge pixel performance of the 100 μ m thick n-on-p sensors is affected only for the last two pixels (up to 110 μ m) subject to biasing conditions. Imaging characteristics of all sensor types investigated are stable over time and the non-uniformities can be minimised by flat-field corrections. The results from the synchrotron tests combined with lab measurements are presented along with an explanation of the observed effects

  4. 160×120 uncooled amorphous silicon TEC-less detector with 25 μm pixel-pitch%像元间距为25 μm、160×120元无热电制冷器的非致冷非晶硅探测器

    Institute of Scientific and Technical Information of China (English)

    J.L.Tissot

    2007-01-01

    介绍用非晶硅微型辐射热量计制成的160×120元非致冷红外焦平面阵列的特点和性能,该阵列集成在一个无铅芯片载体封装中,像素间距为25 μm,适合于大批量生产.25 μm像元结构得益于较小的热时间常数,该技术使我们能够设计出更高的热隔离性能,从而能以35 μm技术为基础开发出25 μm技术.通过采用新的像素设计和更进一步推动设计方法,在没有采用复杂昂贵的双层结构的前提下,保持了较高填充因子.从读出集成电路结构、封装、可操作性和光电性能入手对该探测器进行了介绍.为该探测器设计了一种新型集成读出电路.可以通过串行链接对增益、图像翻转和积分时间等高级功能进行操控,降低电气对接的数量.研制的小型无铅芯片载体封装便于大规模生产探测器,主要用途为便携式摄像机或头盔摄像机.%This paper reviews characteristics and performance of a 160×120 uncooled infrared focal plane array made from amorphous silicon microbolometers with a pixel-pitch of 25 μm,integrated in a LCC package compatible with mass production.The 25 μm pixel architecture profits from the low thermal time constant which characterizes our technology, to design a higher pixel thermal insulation and therefore to develop a 25 μm version from the well mastered 35 μm technology. Thanks to a new pixel design and by pushing the design rules even further, a high fill factor has been kept, without the use of complex, as well as expensive, two-level structure. The detector is described in terms of ROIC architecture, packaging, operability and electro-optical performances.A new read out integrated circuit structure has been designed for this detector. High level functions like gain, image flip and integration time could be operated through a serial link to minimize the number of electrical interconnections.A small LCC package has been developed enabling a mass production of

  5. Silicon sensors for the upgrades of the CMS pixel detector

    Energy Technology Data Exchange (ETDEWEB)

    Centis Vignali, Matteo

    2015-12-15

    The Compact Muon Solenoid (CMS) is a general purpose detector at the Large Hadron Collider (LHC). The LHC luminosity is constantly increased through upgrades of the accelerator and its injection chain. Two major upgrades will take place in the next years. The first upgrade involves the LHC injector chain and allows the collider to achieve a luminosity of about 2.10{sup 34} cm{sup -2}s{sup -1}. A further upgrade of the LHC foreseen for 2025 will boost its luminosity to 5.10{sup 34} cm{sup -2}s{sup -1}. As a consequence of the increased luminosity, the detectors need to be upgraded. In particular, the CMS pixel detector will undergo two upgrades in the next years. The first upgrade (phase I) consists in the substitution of the current pixel detector in winter 2016/2017. The upgraded pixel detector will implement new readout electronics that allow efficient data taking up to a luminosity of 2.10{sup 34} cm{sup -2}s{sup -1}, twice as much as the LHC design luminosity. The modules that will constitute the upgraded detector are being produced at different institutes. Hamburg (University and DESY) is responsible for the production of 350 pixel modules. The second upgrade (phase II) of the pixel detector is foreseen for 2025. The innermost pixel layer of the upgraded detector will accumulate a radiation damage corresponding to an equivalent fluence of Φ{sub eq}=2.10{sup 16} cm{sup -2} and a dose of ∼10 MGy after an integrated luminosity of 3000 fb{sup -1}. Several groups are investigating sensor designs and configurations able to withstand such high doses and fluences. This work is divided into two parts related to important aspects of the upgrades of the CMS pixel detector. For the phase I upgrade, a setup has been developed to provide an absolute energy calibration of the pixel modules that will constitute the detector. The calibration is obtained using monochromatic X-rays. The same setup is used to test the buffering capabilities of the modules' readout chip

  6. Silicon sensors for the upgrades of the CMS pixel detector

    International Nuclear Information System (INIS)

    The Compact Muon Solenoid (CMS) is a general purpose detector at the Large Hadron Collider (LHC). The LHC luminosity is constantly increased through upgrades of the accelerator and its injection chain. Two major upgrades will take place in the next years. The first upgrade involves the LHC injector chain and allows the collider to achieve a luminosity of about 2.1034 cm-2s-1. A further upgrade of the LHC foreseen for 2025 will boost its luminosity to 5.1034 cm-2s-1. As a consequence of the increased luminosity, the detectors need to be upgraded. In particular, the CMS pixel detector will undergo two upgrades in the next years. The first upgrade (phase I) consists in the substitution of the current pixel detector in winter 2016/2017. The upgraded pixel detector will implement new readout electronics that allow efficient data taking up to a luminosity of 2.1034 cm-2s-1, twice as much as the LHC design luminosity. The modules that will constitute the upgraded detector are being produced at different institutes. Hamburg (University and DESY) is responsible for the production of 350 pixel modules. The second upgrade (phase II) of the pixel detector is foreseen for 2025. The innermost pixel layer of the upgraded detector will accumulate a radiation damage corresponding to an equivalent fluence of Φeq=2.1016 cm-2 and a dose of ∼10 MGy after an integrated luminosity of 3000 fb-1. Several groups are investigating sensor designs and configurations able to withstand such high doses and fluences. This work is divided into two parts related to important aspects of the upgrades of the CMS pixel detector. For the phase I upgrade, a setup has been developed to provide an absolute energy calibration of the pixel modules that will constitute the detector. The calibration is obtained using monochromatic X-rays. The same setup is used to test the buffering capabilities of the modules' readout chip. The maximum rate experienced by the modules produced in Hamburg will be 120 MHz

  7. Influence of microstructure and hydrogen concentration on amorphous silicon crystallization

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon samples were deposited on glass substrates at different temperatures by high frequency plasma-enhanced chemical vapor deposition. In this way, samples with different hydrogen concentrations and structures were obtained. The transition from an amorphous to a crystalline material, induced by a four-step thermal annealing sequence, has been followed. Effusion of hydrogen from the films plays an important role in the nucleation and growth mechanisms of crystalline silicon grains. Measurements of hydrogen concentrations, Raman scattering, X-ray diffraction and UV reflectance showed that an enhanced crystallization was obtained on samples deposited at lower substrate temperatures. A correlation between these measurements allows to analyze the evolution of structural properties of the samples. The presence of voids in the material, related to disorder in the amorphous matrix, results in a better quality of the resulting nanocrystalline silicon thin films.

  8. Influence of microstructure and hydrogen concentration on amorphous silicon crystallization

    Energy Technology Data Exchange (ETDEWEB)

    Budini, N., E-mail: nbudini@intec.unl.edu.a [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Rinaldi, P.A. [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Schmidt, J.A.; Arce, R.D.; Buitrago, R.H. [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Facultad de Ingenieria Quimica, UNL, Santiago del Estero 2829, S3000AOM Santa Fe (Argentina)

    2010-07-01

    Hydrogenated amorphous silicon samples were deposited on glass substrates at different temperatures by high frequency plasma-enhanced chemical vapor deposition. In this way, samples with different hydrogen concentrations and structures were obtained. The transition from an amorphous to a crystalline material, induced by a four-step thermal annealing sequence, has been followed. Effusion of hydrogen from the films plays an important role in the nucleation and growth mechanisms of crystalline silicon grains. Measurements of hydrogen concentrations, Raman scattering, X-ray diffraction and UV reflectance showed that an enhanced crystallization was obtained on samples deposited at lower substrate temperatures. A correlation between these measurements allows to analyze the evolution of structural properties of the samples. The presence of voids in the material, related to disorder in the amorphous matrix, results in a better quality of the resulting nanocrystalline silicon thin films.

  9. GHz-rate optical parametric amplifier in hydrogenated amorphous silicon

    International Nuclear Information System (INIS)

    We demonstrate optical parametric amplification operating at GHz-rates at telecommunications wavelengths using a hydrogenated amorphous silicon waveguide through the nonlinear optical process of four-wave mixing. We investigate how the parametric amplification scales with repetition rate. The ability to achieve amplification at GHz-repetition rates shows hydrogenated amorphous silicon’s potential for telecommunication applications and a GHz-rate optical parametric oscillator. (paper)

  10. Grain boundary resistance to amorphization of nanocrystalline silicon carbide

    OpenAIRE

    Dong Chen; Fei Gao; Bo Liu

    2015-01-01

    Under the C displacement condition, we have used molecular dynamics simulation to examine the effects of grain boundaries (GBs) on the amorphization of nanocrystalline silicon carbide (nc-SiC) by point defect accumulation. The results show that the interstitials are preferentially absorbed and accumulated at GBs that provide the sinks for defect annihilation at low doses, but also driving force to initiate amorphization in the nc-SiC at higher doses. The majority of surviving defects are C in...

  11. Modelling structure and properties of amorphous silicon boron nitride ceramics

    OpenAIRE

    Johann Christian Schön; Alexander Hannemann; Guneet Sethi; Ilya Vladimirovich Pentin; Martin Jansen

    2011-01-01

    Silicon boron nitride is the parent compound of a new class of high-temperature stable amorphous ceramics constituted of silicon, boron, nitrogen, and carbon, featuring a set of properties that is without precedent, and represents a prototypical random network based on chemical bonds of predominantly covalent character. In contrast to many other amorphous materials of technological interest, a-Si3B3N7 is not produced via glass formation, i.e. by quenching from a melt, the reason being that th...

  12. Mechanism of Germanium-Induced Perimeter Crystallization of Amorphous Silicon

    OpenAIRE

    Hakim, M. M. A.; Ashburn, P.

    2007-01-01

    We report a study aimed at highlighting the mechanism of a new amorphous silicon crystallization phenomenon that originates from the perimeter of a germanium layer during low-temperature annealing (500°C). Results are reported on doped and undoped amorphous silicon films, with thicknesses in the range 40–200 nm, annealed at a temperature of 500 or 550°C. A comparison is made of crystallization arising from Ge and SiGe layers and the role of damage from a high-dose fluorine implant is investig...

  13. Potential of amorphous and microcrystalline silicon solar cells

    OpenAIRE

    Meier, Johannes; Spitznagel, J.; Kroll, U.; Bucher, C.; Faÿ Sylvie; Moriarty, T.; Shah, Arvind

    2008-01-01

    Low pressure chemical vapour deposition (LP-CVD) ZnO as front transparent conductive oxide (TCO), developed at IMT, has excellent light-trapping properties for a-Si:H p-i-n single-junction and ‘micromorph’ (amorphous/microcrystalline silicon) tandem solar cells. A stabilized record efficiency of 9.47% has independently been confirmed by NREL for an amorphous silicon single-junction p-i-n cell (~1 cm2) deposited on LP-CVD ZnO coated glass. Micromorph tandem cells with an initial efficiency of ...

  14. Surface orientation effects in crystalline-amorphous silicon interfaces

    OpenAIRE

    Nolan, Michael; Legesse, Merid; Fagas, Giorgos

    2012-01-01

    In this paper we present the results of empirical potential and density functional theory (DFT) studies of models of interfaces between amorphous silicon (a-Si) or hydrogenated amorphous Si (a-Si:H) and crystalline Si (c-Si) on three unreconstructed silicon surfaces, namely (100), (110) and (111). In preparing models of a-Si on c-Si, melting simulations are run with classical molecular dynamics (MD) at 3000 K for 10 ps to melt part of the crystalline surface and the structure is quenched to 3...

  15. Optical contrast in ion-implanted amorphous silicon carbide nanostructures

    International Nuclear Information System (INIS)

    Topographic and optical contrasts formed by Ga+ ion irradiation of thin films of amorphous silicon carbide have been investigated with scanning near-field optical microscopy. The influence of ion-irradiation dose has been studied in a pattern of sub-micrometre stripes. While the film thickness decreases monotonically with ion dose, the optical contrast rapidly increases to a maximum value and then decreases gradually. The results are discussed in terms of the competition between the effects of ion implantation and surface milling by the ion beam. The observed effects are important for uses of amorphous silicon carbide thin films as permanent archives in optical data storage applications

  16. Adjustable ultraviolet sensitive detectors based on amorphous silicon

    OpenAIRE

    TOPIC, M; Stiebig, H.; Krause, M.; Wagner, H.

    2001-01-01

    Thin-film detectors made of hydrogenated amorphous silicon (LI-Si:H) and amorphous silicon carbide (a-SiC:H) with adjustable sensitivity in the ultraviolet (UV) spectrum were developed. Thin PIN diodes deposited on glass substrates in N-I-P layer sequence with a total thickness of down to 33 nm and a semitransparent Ag front contact were fabricated. The optimized diodes with a 10 nm Ag contact exhibit spectral response values above 80 mA/W in the wavelength range from 295 to 395 nm with a max...

  17. Amorphous Silicon Carbide for Photovoltaic Applications

    OpenAIRE

    JANZ, Stefan

    2006-01-01

    Within this work amorphous SiC is investigated for its applicability in photovoltaic devices. The temperature stability and dopability of SiC makes this material very attractive for applications in this area. Physical basics of amorphous SiC networks and plasma processes are discussed and first measurements with FTIR of the different layer types show the complexity of the network. The special features of the plasma reactor such as high temperature deposition and two-source excitation are also...

  18. Development and characterization of diamond and 3D-silicon pixel detectors with ATLAS-pixel readout electronics

    International Nuclear Information System (INIS)

    Hybrid pixel detectors are used for particle tracking in the innermost layers of current high energy experiments like ATLAS. After the proposed luminosity upgrade of the LHC, they will have to survive very high radiation fluences of up to 1016 particles per cm2 per life time. New sensor concepts and materials are required, which promise to be more radiation tolerant than the currently used planar silicon sensors. Most prominent candidates are so-called 3D-silicon and single crystal or poly-crystalline diamond sensors. Using the ATLAS pixel electronics different detector prototypes with a pixel geometry of 400 x 50 μm2 have been built. In particular three devices have been studied in detail: a 3D-silicon and a single crystal diamond detector with an active area of about 1 cm2 and a poly-crystalline diamond detector of the same size as a current ATLAS pixel detector module (2 x 6 cm2). To characterize the devices regarding their particle detection efficiency and spatial resolution, the charge collection inside a pixel cell as well as the charge sharing between adjacent pixels was studied using a high energy particle beam. (orig.)

  19. Development and characterization of diamond and 3D-silicon pixel detectors with ATLAS-pixel readout electronics

    Energy Technology Data Exchange (ETDEWEB)

    Mathes, Markus

    2008-12-15

    Hybrid pixel detectors are used for particle tracking in the innermost layers of current high energy experiments like ATLAS. After the proposed luminosity upgrade of the LHC, they will have to survive very high radiation fluences of up to 10{sup 16} particles per cm{sup 2} per life time. New sensor concepts and materials are required, which promise to be more radiation tolerant than the currently used planar silicon sensors. Most prominent candidates are so-called 3D-silicon and single crystal or poly-crystalline diamond sensors. Using the ATLAS pixel electronics different detector prototypes with a pixel geometry of 400 x 50 {mu}m{sup 2} have been built. In particular three devices have been studied in detail: a 3D-silicon and a single crystal diamond detector with an active area of about 1 cm{sup 2} and a poly-crystalline diamond detector of the same size as a current ATLAS pixel detector module (2 x 6 cm{sup 2}). To characterize the devices regarding their particle detection efficiency and spatial resolution, the charge collection inside a pixel cell as well as the charge sharing between adjacent pixels was studied using a high energy particle beam. (orig.)

  20. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    International Nuclear Information System (INIS)

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature Tp = 270 to 360 °C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at Tp ≥ 330 °C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at Tp ≥ 360 °C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: ► We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. ► The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. ► We investigate basic properties in relation to the pyrolysis temperature. ► Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. ► Microstructure factor, spin density, and photoconductivity show poor quality.

  1. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    OpenAIRE

    Masuda, Takashi; Matsuki, Yasuo; Shimoda, Tatsuya

    2012-01-01

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of S...

  2. Temperature dependence of hydrogenated amorphous silicon solar cell performances

    OpenAIRE

    Riesen, Y.; Stuckelberger, M.; Haug, F. -J.; Ballif, C.; N. Wyrsch

    2016-01-01

    Thin-film hydrogenated amorphous silicon solar (a-Si:H) cells are known to have better temperature coefficients than crystalline silicon cells. To investigate whether a-Si:H cells that are optimized for standard conditions (STC) also have the highest energy yield, we measured the temperature and irradiance dependence of the maximum power output (Pmpp), the fill factor (FF), the short-circuit current density (Jsc), and the open-circuit voltage (Voc) for four series of cells fabricated with dif...

  3. A study of factors limiting spatial resolution using a 25 micron pixel pitch direct-detection amorphous selenium imaging system

    Science.gov (United States)

    Scott, Chris C.; Allec, Nicholas; Karim, Karim S.

    2012-03-01

    An amorphous selenium direct detector with a 25 μm pixel pitch is studied for mammography and fluoroscopy applications. In this paper we analyze spatial resolution by examining the main contributions to the inherent modulation transfer function (MTF) of amorphous selenium, such as primary photoelectron range and x-ray beam obliquity; and determine their significance relative to aperture MTF. Improvements in spatial resolution provided by a move to a small pixel size are complicated by deep carrier trapping. Trapped carriers cause residual charge induction across the pixel plane. We examine the significance of this effect on spatial resolution. The potential improvements of moving from a larger pixel pitch to a 25 μm pixel pitch are studied, including all significant effects, at selected pixel pitches.

  4. Amorphous silicon image sensors for x-ray detection in NDT

    International Nuclear Information System (INIS)

    Acquiring radiographic images in a digital format offers significant advantages over film. Besides eliminating the need for chemical processing, a digital image can be easily stored for more convenient retrieval, transmitted to remote locations for interpretation, and image processed to provide enhanced interpretation and greater latitude in exposure. Amorphous silicon image sensors, developed by dpiX, a Xerox Company, offer an improved method of acquiring digital x-ray images. Amorphous silicon image sensor technology provides the opportunity to have large format size similar to x-ray film, high resolution, and a compact package for ease of use in NDT applications. This technology can also be used to replace x-ray image intensifier tubes to provide real-time fluoroscopic imaging for capturing time related events such as x-ray examination of objects on a conveyor belt. This paper presents a description of amorphous silicon image sensor technology and provides examples of the performance that can be achieved using a system that has an 8 x 10 inch x-ray image acquisition area and 127 micron pixels for 4 lp/mm resolution

  5. Nanoindentation-induced amorphization in silicon carbide

    Science.gov (United States)

    Szlufarska, Izabela; Kalia, Rajiv K.; Nakano, Aiichiro; Vashishta, Priya

    2004-07-01

    The nanoindentation-induced amorphization in SiC is studied using molecular dynamics simulations. The load-displacement response shows an elastic shoulder followed by a plastic regime consisting of a series of load drops. Analyses of bond angles, local pressure, and shear stress, and shortest-path rings show that these drops are related to dislocation activities under the indenter. We show that amorphization is driven by coalescence of dislocation loops and that there is a strong correlation between load-displacement response and ring distribution.

  6. First-principles study of hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Jarolimek, K.; Groot, R.A. de; Wijs, G.A. de; Zeman, M.

    2009-01-01

    We use a molecular-dynamics simulation within density-functional theory to prepare realistic structures of hydrogenated amorphous silicon. The procedure consists of heating a crystalline structure of Si64H8 to 2370 K, creating a liquid and subsequently cooling it down to room temperature. The effect

  7. Photocurrent images of amorphous-silicon solar-cell modules

    Science.gov (United States)

    Kim, Q.; Shumka, A.; Trask, J.

    1985-01-01

    Results obtained in applying the unique characteristics of the solar cell laser scanner to investigate the defects and quality of amorphous silicon cells are presented. It is concluded that solar cell laser scanners can be effectively used to nondestructively test not only active defects but also the cell quality and integrity of electrical contacts.

  8. Long-term stability of amorphous-silicon modules

    Science.gov (United States)

    Ross, R. G., Jr.

    1986-01-01

    The Jet Propulsion Laboratory (JPL) program of developing qualification tests necessary for amorphous silicon modules, including appropriate accelerated environmental tests reveal degradation due to illumination. Data were given which showed the results of temperature-controlled field tests and accelerated tests in an environmental chamber.

  9. Integral bypass diodes in an amorphous silicon alloy photovoltaic module

    Science.gov (United States)

    Hanak, J. J.; Flaisher, H.

    1991-01-01

    Thin-film, tandem-junction, amorphous silicon (a-Si) photovoltaic modules were constructed in which a part of the a-Si alloy cell material is used to form bypass protection diodes. This integral design circumvents the need for incorporating external, conventional diodes, thus simplifying the manufacturing process and reducing module weight.

  10. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    NARCIS (Netherlands)

    Jarolimek, K.; De Groot, R.A.; De Wijs, G.A.; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principle

  11. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    NARCIS (Netherlands)

    Jarolimek, K.; Groot, R.A. de; Wijs, G.A. de; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principle

  12. A new tevchnique for production of amorphous silicon solar cells

    International Nuclear Information System (INIS)

    It is presented a new technique for the production of amorphous silicon solar cells based on the development of thin films of a-Si in a reactor in which the decomposition of the sylane, induced by capacitively coupled RF, and the film deposition occur in separate chambers. (M.W.O.)

  13. Amorphous silicon carbide coatings for extreme ultraviolet optics

    Science.gov (United States)

    Kortright, J. B.; Windt, David L.

    1988-01-01

    Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

  14. Ion-assisted recrystallization of amorphous silicon

    Science.gov (United States)

    Priolo, F.; Spinella, C.; La Ferla, A.; Rimini, E.; Ferla, G.

    1989-12-01

    Our recent work on ion-beam-assisted epitaxial growth of amorphous Si layers on single crystal substrates is reviewed. The planar motion of the crystal-amorphous interface was monitored in situ, during irradiations, by transient reflectivity measurements. This technique allows the measurement of the ion-induced growth rate with a very high precision. We have observed that this growth rate scales linearly with the number of displacements produced at the crystal-amorphous interface by the impinging ions. Moreover the regrowth onto oriented substrates is a factor of ≈ 4 faster with respect to that on substrates. Impurities dissolved in the amorphous layer influence the kinetics of recrystallization. For instance, dopants such as As, B and P enhance the ion-induced growth rate while oxygen has the opposite effect. The dependence of the rate on impurity concentration is however less strong with respect to pure thermal annealing. For instance, an oxygen concentration of 1 × 1021 / cm3 decreases the ion-induced growth rate by a factor of ≈ 3; this same concentration would have decreased the rate of pure thermal annealing by more than 4 orders of magnitude. The reduced effects of oxygen during ion-beam crystallization allow the regrowth of deposited Si layers despite the presence of a high interfacial oxygen content. The process is investigated in detail and its possible application to the microelectronic technology is discussed.

  15. Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth

    International Nuclear Information System (INIS)

    The present study demonstrates the growth of silicon nanocrystals on amorphous silicon carbide alloy thin films. Amorphous silicon carbide films [a-Si1−xCx:H (with x 1−xCx:H layer. The effect of short-time annealing at 700 °C on the composition and properties of the layer was studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was observed that the silicon-to-carbon ratio in the layer remains unchanged after short-time annealing, but the reorganization of the film due to a large dehydrogenation leads to a higher density of SiC bonds. Moreover, the film remains amorphous after the performed short-time annealing. In a second part, it was shown that a high density (1 × 1012 cm−2) of silicon nanocrystals can be grown by low pressure chemical vapor deposition on a-Si0.8C0.2 surfaces at 700 °C, from silane diluted in hydrogen. The influence of growth time and silane partial pressure on nanocrystals size and density was studied. It was also found that amorphous silicon carbide surfaces enhance silicon nanocrystal nucleation with respect to SiO2, due to the differences in surface chemical properties. - Highlights: ► Silicon nanocrystals (Si-NC) growth on amorphous silicon carbide alloy thin films ► Plasma deposited amorphous silicon carbide films with well-controlled properties ► Study on the thermal effect of 700 °C short-time annealing on the layer properties ► Low pressure chemical vapor deposition (LPCVD) of Si-NC ► High density (1 × 1012 cm−2) of Si-NC was achieved on a-Si0.8C0.2 surfaces by LPCVD.

  16. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor deposition (PECVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scattering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  17. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    LIAO NaiMan; LI Wei; KUANG YueJun; JIANG YaDong; LI ShiBin; WU ZhiMing; QI KangCheng

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor depo-sition (PEOVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scat-tering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  18. Hydrogen-free amorphous silicon with no tunneling states.

    Science.gov (United States)

    Liu, Xiao; Queen, Daniel R; Metcalf, Thomas H; Karel, Julie E; Hellman, Frances

    2014-07-11

    The ubiquitous low-energy excitations, known as two-level tunneling systems (TLSs), are one of the universal phenomena of amorphous solids. Low temperature elastic measurements show that e-beam amorphous silicon (a-Si) contains a variable density of TLSs which diminishes as the growth temperature reaches 400 °C. Structural analyses show that these a-Si films become denser and more structurally ordered. We conclude that the enhanced surface energetics at a high growth temperature improved the amorphous structural network of e-beam a-Si and removed TLSs. This work obviates the role hydrogen was previously thought to play in removing TLSs in the hydrogenated form of a-Si and suggests it is possible to prepare "perfect" amorphous solids with "crystal-like" properties for applications. PMID:25062205

  19. Amorphous selenium direct detection CMOS digital x-ray imager with 25 micron pixel pitch

    Science.gov (United States)

    Scott, Christopher C.; Abbaszadeh, Shiva; Ghanbarzadeh, Sina; Allan, Gary; Farrier, Michael; Cunningham, Ian A.; Karim, Karim S.

    2014-03-01

    We have developed a high resolution amorphous selenium (a-Se) direct detection imager using a large-area compatible back-end fabrication process on top of a CMOS active pixel sensor having 25 micron pixel pitch. Integration of a-Se with CMOS technology requires overcoming CMOS/a-Se interfacial strain, which initiates nucleation of crystalline selenium and results in high detector dark currents. A CMOS-compatible polyimide buffer layer was used to planarize the backplane and provide a low stress and thermally stable surface for a-Se. The buffer layer inhibits crystallization and provides detector stability that is not only a performance factor but also critical for favorable long term cost-benefit considerations in the application of CMOS digital x-ray imagers in medical practice. The detector structure is comprised of a polyimide (PI) buffer layer, the a-Se layer, and a gold (Au) top electrode. The PI layer is applied by spin-coating and is patterned using dry etching to open the backplane bond pads for wire bonding. Thermal evaporation is used to deposit the a-Se and Au layers, and the detector is operated in hole collection mode (i.e. a positive bias on the Au top electrode). High resolution a-Se diagnostic systems typically use 70 to 100 μm pixel pitch and have a pre-sampling modulation transfer function (MTF) that is significantly limited by the pixel aperture. Our results confirm that, for a densely integrated 25 μm pixel pitch CMOS array, the MTF approaches the fundamental material limit, i.e. where the MTF begins to be limited by the a-Se material properties and not the pixel aperture. Preliminary images demonstrating high spatial resolution have been obtained from a frst prototype imager.

  20. Amorphous silicon rich silicon nitride optical waveguides for high density integrated optics

    DEFF Research Database (Denmark)

    Philipp, Hugh T.; Andersen, Karin Nordström; Svendsen, Winnie Edith;

    2004-01-01

    Amorphous silicon rich silicon nitride optical waveguides clad in silica are presented as a high-index contrast platform for high density integrated optics. Performance of different cross-sectional geometries have been measured and are presented with regards to bending loss and insertion loss. A...

  1. Heat-Induced Agglomeration of Amorphous Silicon Nanoparticles Toward the Formation of Silicon Thin Film.

    Science.gov (United States)

    Jang, Bo Yun; Kim, Ja Young; Seo, Gyeongju; Shin, Chae-Ho; Ko, Chang Hyun

    2016-01-01

    The thermal behavior of silicon nanoparticles (Si NPs) was investigated for the preparation of silicon thin film using a solution process. TEM analysis of Si NPs, synthesized by inductively coupled plasma, revealed that the micro-structure of the Si NPs was amorphous and that the Si NPs had melted and merged at a comparatively low temperature (~750 °C) considering bulk melting temperature of silicon (1414 °C). A silicon ink solution was prepared by dispersing amorphous Si NPs in propylene glycol (PG). It was then coated onto a silicon wafer and a quartz plate to form a thin film. These films were annealed in a vacuum or in an N₂ environment to increase their film density. N2 annealing at 800 °C and 1000 °C induced the crystallization of the amorphous thin film. An elemental analysis by the SIMS depth profile showed that N₂annealing at 1000 °C for 180 min drastically reduced the concentrations of carbon and oxygen inside the silicon thin film. These results indicate that silicon ink prepared using amorphous Si NPs in PG can serve as a proper means of preparing silicon thin film via solution process. PMID:27398566

  2. High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; van Sark, W.G.J.H.M.; Rath, J.K.

    2011-01-01

    We investigate the influence of thermal annealing on the passivation quality of crystalline silicon (c-Si) surfaces by intrinsic and n-type hydrogenated amorphous silicon (a-Si:H) films. For temperatures up to 255 C, we find an increase in surface passivation quality, corresponding to a decreased da

  3. Role of amorphous silicon domains on Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    陈长勇; 陈维德; 李国华; 宋淑芳; 丁琨; 许振嘉

    2003-01-01

    An investigation on the correlation between amorphous Si (a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carriers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:Hfilms.

  4. Role of amorphous silicon domains of Er3+ emission in the Er—doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    ChenChang-Yong; ChenWei-De; LeGuo-Hua; SongShu-Fang; DingKun; XuZhen-Jia

    2003-01-01

    An investigation on the correlation between amorphous Si(a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carrlers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:H films.

  5. Multi-band silicon quantum dots embedded in an amorphous matrix of silicon carbide.

    Science.gov (United States)

    Chang, Geng-rong; Ma, Fei; Ma, Da-yan; Xu, Ke-wei

    2010-11-19

    Silicon quantum dots embedded in an amorphous matrix of silicon carbide were realized by a magnetron co-sputtering process and post-annealing. X-ray photoelectron spectroscopy, glancing x-ray diffraction, Raman spectroscopy and high-resolution transmission electron microscopy were used to characterize the chemical composition and the microstructural properties. The results show that the sizes and size distribution of silicon quantum dots can be tuned by changing the annealing atmosphere and the atom ratio of silicon and carbon in the matrix. A physicochemical mechanism is proposed to demonstrate this formation process. Photoluminescence measurements indicate a multi-band configuration due to the quantum confinement effect of silicon quantum dots with different sizes. The PL spectra are further widened as a result of the existence of amorphous silicon quantum dots. This multi-band configuration would be extremely advantageous in improving the photoelectric conversion efficiency of photovoltaic solar cells. PMID:20975214

  6. Multi-band silicon quantum dots embedded in an amorphous matrix of silicon carbide

    International Nuclear Information System (INIS)

    Silicon quantum dots embedded in an amorphous matrix of silicon carbide were realized by a magnetron co-sputtering process and post-annealing. X-ray photoelectron spectroscopy, glancing x-ray diffraction, Raman spectroscopy and high-resolution transmission electron microscopy were used to characterize the chemical composition and the microstructural properties. The results show that the sizes and size distribution of silicon quantum dots can be tuned by changing the annealing atmosphere and the atom ratio of silicon and carbon in the matrix. A physicochemical mechanism is proposed to demonstrate this formation process. Photoluminescence measurements indicate a multi-band configuration due to the quantum confinement effect of silicon quantum dots with different sizes. The PL spectra are further widened as a result of the existence of amorphous silicon quantum dots. This multi-band configuration would be extremely advantageous in improving the photoelectric conversion efficiency of photovoltaic solar cells.

  7. Electrical Characterization of Amorphous Silicon Nitride Passivation Layers for Crystalline Silicon Solar Cells

    OpenAIRE

    Helland, Susanne

    2011-01-01

    High quality surface passivation is important for the reduction of recombination losses in solar cells. In this work, the passivation properties of amorphous hydrogenated silicon nitride for crystalline silicon solar cells were investigated, using electrical characterization, lifetime measurements and spectroscopic ellipsometry. Thin films of varying composition were deposited on p-type monocrystalline silicon wafers by plasma enhanced chemical vapor deposition (PECVD). Highest quality surfac...

  8. Kirchhoff?s generalised law applied to amorphous silicon / crystalline silicon heterostructures

    OpenAIRE

    Brüggemann, Rudolf

    2009-01-01

    Abstract The electro- and photoluminescence spectra of amorphous silicon / crystalline silicon heterostructures and solar cells are determined by emission from the crystalline-silicon layer and are computed with Kirchhoff?s generalised law. The interface defect density strongly influences the luminescence yield which may be used to monitor the interface quality. Based on a comparison between numerical and analytically determined spectra, the temperature dependence of experimental e...

  9. Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix

    International Nuclear Information System (INIS)

    The nanocrystalline silicon embedded in amorphous silicon carbide matrix was prepared by varying rf power in high vacuum plasma enhanced chemical vapor deposition system using silane methane gas mixture highly diluted in hydrogen. In this paper, we have studied the evolution of the structural, optical, and electrical properties of this material as a function of rf power. We have observed visible photoluminescence at room temperature and also have discussed the role played by the Si nanocrystallites and the amorphous silicon carbide matrix. The decrease of the nanocrystalline size, responsible for quantum confinement effect, facilitated by the amorphous silicon carbide matrix, is shown to be the primary cause for the increase in the PL intensity, blueshift of the PL peak position, decrease of the PL width (full width at half maximum) as well as the increase of the optical band gap and the decrease of the dark conductivity

  10. Plasma Deposition of Doped Amorphous Silicon

    Science.gov (United States)

    Calcote, H. F.

    1985-01-01

    Pair of reports present further experimental details of investigation of plasma deposition of films of phosphorous-doped amosphous silicon. Probe measurements of electrical resistance of deposited films indicated films not uniform. In general, it appeared that resistance decreased with film thickness.

  11. Development and Characterization of Diamond and 3D-Silicon Pixel Detectors with ATLAS-Pixel Readout Electronics

    CERN Document Server

    Mathes, Markus

    2008-01-01

    Abstract: Hybrid pixel detectors are used for particle tracking in the innermost layers of current high energy experiments like ATLAS. After the proposed luminosity upgrade of the LHC, they will have to survive very high radiation fluences of up to 10^16 particles per cm^2 per life time. New sensor concepts and materials are required, which promise to be more radiation tolerant than the currently used planar silicon sensors. Most prominent candidates are so-called 3D-silicon and single crystal or poly-crystalline diamond sensors. Using the ATLAS pixel electronics different detector prototypes with a pixel geometry of 400 × 50 um^2 have been built. In particular three devices have been studied in detail: a 3D-silicon and a single crystal diamond detector with an active area of about 1 cm^2 and a poly-crystalline diamond detector of the same size as a current ATLAS pixel detector module (2 × 6 cm^2). To characterize the devices regarding their particle detection efficiency and spatial resolution, the charge c...

  12. Light-induced metastable structural changes in hydrogenated amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Fritzsche, H. [Univ. of Chicago, IL (United States)

    1996-09-01

    Light-induced defects (LID) in hydrogenated amorphous silicon (a-Si:H) and its alloys limit the ultimate efficiency of solar panels made with these materials. This paper reviews a variety of attempts to find the origin of and to eliminate the processes that give rise to LIDs. These attempts include novel deposition processes and the reduction of impurities. Material improvements achieved over the past decade are associated more with the material`s microstructure than with eliminating LIDs. We conclude that metastable LIDs are a natural by-product of structural changes which are generally associated with non-radiative electron-hole recombination in amorphous semiconductors.

  13. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    Energy Technology Data Exchange (ETDEWEB)

    Masuda, Takashi, E-mail: mtakashi@jaist.ac.jp [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Matsuki, Yasuo [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Yokkaichi Research Center, JSR Corporation, 100 Kawajiri-cho, Yokkaichi, Mie, 510-8552 (Japan); Shimoda, Tatsuya [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292 (Japan)

    2012-08-31

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature T{sub p} = 270 to 360 Degree-Sign C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at T{sub p} {>=} 330 Degree-Sign C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at T{sub p} {>=} 360 Degree-Sign C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: Black-Right-Pointing-Pointer We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. Black-Right-Pointing-Pointer The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. Black-Right-Pointing-Pointer We investigate basic properties in relation to the pyrolysis temperature. Black-Right-Pointing-Pointer Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. Black-Right-Pointing-Pointer Microstructure factor, spin density, and photoconductivity show poor quality.

  14. On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon

    NARCIS (Netherlands)

    Sharma, K.; Branca, A.; Illiberi, A.; Tichelaar, F. D.; Creatore, M.; M. C. M. van de Sanden,

    2011-01-01

    In this paper the effect of the microstructure of remote plasma-deposited amorphous silicon films on the grain size development in polycrystalline silicon upon solid-phase crystallization is reported. The hydrogenated amorphous silicon films are deposited at different microstructure parameter values

  15. Hydrogen, microstructure and defect density in hydrogenated amorphous silicon

    OpenAIRE

    Roca I Cabarrocas, Pere; Djebbour, Z.; Kleider, J.; Longeaud, C.; Mencaraglia, D.; Sib, J.; Bouizem, Y.; Thèye, M.; Sardin, G.; Stoquert, J.

    1992-01-01

    It is well established that by bonding with the dangling bonds of silicon, hydrogen reduces the density of states of amorphous silicon and renders this material suitable to electronic applications. For so-called “standard” a-Si : H films deposited by the RF glow discharge decomposition of silane at low deposition rates (≈1 Å/s) and over a large range of deposition temperatures, we observed the usual correlation between the hydrogen bonding and the defect density in the as-deposited material o...

  16. Photo stability Assessment in Amorphous-Silicon Solar Cells

    International Nuclear Information System (INIS)

    The present status of amorphous-silicon-solar-cell research and development at CIEMAT requires the possibility to characterise the devices prepared from the point of view of their stability against sunlight exposure. Therefore a set of tools providing such a capacity has been developed. Together with an introduction to photovoltaic applications of amorphous silicon and to the photodegradation problem, the present work describes the process of setting up these tools. An indoor controlled photodegradation facility has been designed and built, and a procedure has been developed for the measurement of J-V characterisation in well established conditions. This method is suitable for all kinds of solar cells, even for those for which no model is still available. The photodegradation and characterisation of some cells has allowed to validate both the new testing facility and method. (Author) 14 refs

  17. The reliability and stability of multijunction amorphous silicon PV modules

    Energy Technology Data Exchange (ETDEWEB)

    Carlson, D.E. [Solarex, Newtown, PA (United States)

    1995-11-01

    Solarex is developing a manufacturing process for the commercial production of 8 ft{sup 2} multijunction amorphous silicon (a-Si) PV modules starting in 1996. The device structure used in these multijunction modules is: glass/textured tin oxide/p-i-n/p-i-n/ZnO/Al/EVA/Tedlar where the back junction of the tandem structure contains an amorphous silicon germanium alloy. As an interim step, 4 ft{sup 2} multijunction modules have been fabricated in a pilot production mode over the last several months. The distribution of initial conversion efficiencies for an engineering run of 67 modules (4 ft{sup 2}) is shown. Measurements recently performed at NREL indicate that the actual efficiencies are about 5% higher than those shown, and thus exhibit an average initial conversion efficiency of about 9.5%. The data indicates that the process is relatively robust since there were no modules with initial efficiencies less than 7.5%.

  18. Spherical silicon photonic microcavities: From amorphous to polycrystalline

    Science.gov (United States)

    Fenollosa, R.; Garín, M.; Meseguer, F.

    2016-06-01

    Shaping silicon as a spherical object is not an obvious task, especially when the object size is in the micrometer range. This has the important consequence of transforming bare silicon material in a microcavity, so it is able to confine light efficiently. Here, we have explored the inside volume of such microcavities, both in their amorphous and in their polycrystalline versions. The synthesis method, which is based on chemical vapor deposition, causes amorphous microspheres to have a high content of hydrogen that produces an onionlike distributed porous core when the microspheres are crystallized by a fast annealing regime. This substantially influences the resonant modes. However, a slow crystallization regime does not yield pores, and produces higher-quality-factor resonances that could be fitted to the Mie theory. This allows the establishment of a procedure for obtaining size calibration standards with relative errors of the order of 0.1%.

  19. Electrochemical degradation of amorphous-silicon photovoltaic modules

    Science.gov (United States)

    Mon, G. R.; Ross, R. G., Jr.

    1985-01-01

    Techniques of module electrochemical corrosion research, developed during reliability studies of crystalline-silicon modules (C-Si), have been applied to this new investigation into amorphous-silicon (a-Si) module reliability. Amorphous-Si cells, encapsulated in the polymers polyvinyl butyral (PVB) and ethylene vinyl acetate (EVA), were exposed for more than 1200 hours in a controlled 85 C/85 percent RH environment, with a constant 500 volts applied between the cells and an aluminum frame. Plotting power output reduction versus charge transferred reveals that about 50 percent a-Si cell failures can be expected with the passage of 0.1 to 1.0 Coulomb/cm of cell-frame edge length; this threshold is somewhat less than that determined for C-Si modules.

  20. Charged particle detectors made from thin layers of amorphous silicon

    International Nuclear Information System (INIS)

    A series of experiments was conducted to determine the feasibility of using hydrogenated amorphous silicon (α-Si:H) as solid state thin film charged particle detectors. 241Am alphas were successfully detected with α-Si:H devices. The measurements and results of these experiments are presented. The problems encountered and changes in the fabrication of the detectors that may improve the performance are discussed

  1. Amorphous Silicon 16—bit Array Photodetector①

    Institute of Scientific and Technical Information of China (English)

    ZHANGShaoqiang; XUZhongyang; 等

    1997-01-01

    An amorphous silicon 16-bit array photodetector with the a-SiC/a-Si heterojunction diode is presented.The fabrication processes of the device were studied systematically.By the optimum of the diode structure and the preparation procedures,the diode with Id<10-12A/mm2 and photocurrentIp≥0.35A/W has been obtained at the wavelength of 632nm.

  2. Corrosion In Amorphous-Silicon Solar Cells And Modules

    Science.gov (United States)

    Mon, Gordon R.; Wen, Liang-Chi; Ross, Ronald G., Jr.

    1988-01-01

    Paper reports on corrosion in amorphous-silicon solar cells and modules. Based on field and laboratory tests, discusses causes of corrosion, ways of mitigating effects, and consequences for modules already in field. Suggests sealing of edges as way of reducing entry of moisture. Cell-free perimeters or sacrificial electrodes suggested to mitigate effects of sorbed moisture. Development of truly watertight module proves to be more cost-effective than attempting to mitigate effects of moisture.

  3. Thermally stimulated H emission and diffusion in hydrogenated amorphous silicon

    OpenAIRE

    Abtew, T. A.; Inam, F.; Drabold, D. A.

    2006-01-01

    We report first principles ab initio density functional calculations of hydrogen dynam- ics in hydrogenated amorphous silicon. Thermal motion of the host Si atoms drives H diffusion, as we demonstrate by direct simulation and explain with simple models. Si-Si bond centers and Si ring centers are local energy minima as expected. We also describe a new mechanism for break- ing Si-H bonds to release free atomic H into the network: a fluctuation bond center detachment (FBCD) assisted diffusion. H...

  4. Crystallization of amorphous silicon induced by mechanical shear deformations

    OpenAIRE

    Kerrache, Ali; Mousseau, Normand; Lewis, Laurent J.

    2011-01-01

    We have investigated the response of amorphous silicon (a-Si), in particular crystallization, to external mechanical shear deformations using classical molecular dynamics (MD) simulations and the empirical Environment Dependent Inter-atomic Potential (EDIP) [Phys. Rev. B 56, 8542 (1997)]. In agreement with previous results we find that, at low shear velocity and low temperature, shear deformations increase disorder and defect density. At high temperatures, however, the deformations are found ...

  5. Deposition-induced defect profiles in amorphous hydrogenated silicon

    OpenAIRE

    Hata, N.; Wagner, S.; Roca i Cabarrocas, P.; Favre, M.

    2008-01-01

    The thickness dependence of the subgap optical absorption in plasma-deposited hydrogenated amorphous silicon is carefully studied by photothermal deflection spectroscopy. The deep-level defect concentration decays from the top surface into the bulk where it approaches the thermal equilibrium defect density. This defect profile is interpreted in terms of the annealing, during growth, of growth-induced surface defects. It is also shown that this defect profile is compatible with the known growt...

  6. First-principles study of hydrogenated amorphous silicon

    OpenAIRE

    Jarolimek, K.; de Groot, R. A.; de Wijs, G. A.; Zeman, M.

    2009-01-01

    We use a molecular-dynamics simulation within density-functional theory to prepare realistic structures of hydrogenated amorphous silicon. The procedure consists of heating a crystalline structure of Si64H8 to 2370 K, creating a liquid and subsequently cooling it down to room temperature. The effect of the cooling rate is examined. We prepared a total of five structures which compare well to experimental data obtained by neutron-scattering experiments. Two structures do not contain any struct...

  7. Optical characterization and density of states determination of silicon nanocrystals embedded in amorphous silicon based matrix

    International Nuclear Information System (INIS)

    We present a non-destructive measurement and simple analysis method for obtaining the absorption coefficient of silicon nanocrystals (NCs) embedded in an amorphous matrix. This method enables us to pinpoint the contribution of silicon NCs to the absorption spectrum of NC containing films. The density of states (DOS) of the amorphous matrix is modelled using the standard model for amorphous silicon while the NCs are modelled using one Gaussian distribution for the occupied states and one for the unoccupied states. For laser annealed a-Si0.66O0.34:H films, our analysis shows a reduction of the NC band gap from approximately 2.34–2.08 eV indicating larger mean NC size for increasing annealing laser fluences, accompanied by a reduction in NC DOS distribution width from 0.28–0.26 eV, indicating a narrower size distribution. (paper)

  8. Test of prototypes of the ALICE silicon pixel detector in a multi-track environment

    Science.gov (United States)

    Pulvirenti, A.; Anelli, G.; Antinori, F.; Badalà, A.; Bruno, G. E.; Burns, M.; Cali, I. A.; Campbell, M.; Caselle, M.; Ceresa, S.; Chocula, P.; Cinausero, M.; Conrad, J.; Dima, R.; Elia, D.; Fabris, D.; Fini, R. A.; Fioretto, E.; Kapusta, S.; Kluge, A.; Krivda, M.; Lenti, V.; Librizzi, F.; Lunardon, M.; Manzari, V.; Morel, M.; Moretto, S.; Osmic, F.; Pappalardo, G. S.; Paticchio, V.; Pepato, A.; Prete, G.; Riedler, P.; Riggi, F.; Sandor, L.; Santoro, R.; Scarlassara, F.; Segato, G.; Soramel, F.; Stefanini, G.; Torcato de Matos, C.; Turrisi, R.; Vannucci, L.; Viesti, G.; Virgili, T.

    2006-09-01

    The silicon pixel detector (SPD) comprises the two innermost layers of the ALICE Inner Tracking System (ITS). It is instrumented with arrays of hybrid pixels made out of 150 μm thick ASICs, each containing 8192 readout cells, bump bonded to 200 μm thick silicon sensors. The dimensions of the pixel cells are 50 μm ( rϕ)×425 μm ( z). Prototype assemblies have been tested in high-energy particle beams at the CERN SPS. The results of measurements in a multi-track environment, from interactions of an In beam at 158 AGeV on a Pb target, are reported.

  9. Initial steps toward the realization of large area arrays of single photon counting pixels based on polycrystalline silicon TFTs

    Science.gov (United States)

    Liang, Albert K.; Koniczek, Martin; Antonuk, Larry E.; El-Mohri, Youcef; Zhao, Qihua; Jiang, Hao; Street, Robert A.; Lu, Jeng Ping

    2014-03-01

    The thin-film semiconductor processing methods that enabled creation of inexpensive liquid crystal displays based on amorphous silicon transistors for cell phones and televisions, as well as desktop, laptop and mobile computers, also facilitated the development of devices that have become ubiquitous in medical x-ray imaging environments. These devices, called active matrix flat-panel imagers (AMFPIs), measure the integrated signal generated by incident X rays and offer detection areas as large as ~43×43 cm2. In recent years, there has been growing interest in medical x-ray imagers that record information from X ray photons on an individual basis. However, such photon counting devices have generally been based on crystalline silicon, a material not inherently suited to the cost-effective manufacture of monolithic devices of a size comparable to that of AMFPIs. Motivated by these considerations, we have developed an initial set of small area prototype arrays using thin-film processing methods and polycrystalline silicon transistors. These prototypes were developed in the spirit of exploring the possibility of creating large area arrays offering single photon counting capabilities and, to our knowledge, are the first photon counting arrays fabricated using thin film techniques. In this paper, the architecture of the prototype pixels is presented and considerations that influenced the design of the pixel circuits, including amplifier noise, TFT performance variations, and minimum feature size, are discussed.

  10. Development of hybrid photon detectors with integrated silicon pixel readout for the RICH counters of LHCb

    CERN Document Server

    Alemi, M; Formenti, F; Gys, Thierry; Piedigrossi, D; Puertolas, D; Rosso, E; Snoeys, W; Wyllie, Ken H

    1999-01-01

    We report on the ongoing work towards a hybrid photon detector with integrated silicon pixel readout for the ring imaging Cherenkov detectors of the LHCb experiment at the Large Hadron Collider at CERN. The photon detector is based $9 on a cross-focussed image intensifier tube geometry where the image is de-magnified by a factor of 4. The anode consists of a silicon pixel array, bump-bonded to a fast, binary readout chip with matching pixel electronics. The $9 performance of a half-scale prototype is presented, together with the developments and tests of a full-scale tube with large active area. Specific requirements for pixel front-end and readout electronics in LHCb are outlined, and $9 recent results obtained from pixel chips applicable to hybrid photon detector design are summarized.

  11. Surface bioactivity of plasma implanted silicon and amorphous carbon

    Institute of Scientific and Technical Information of China (English)

    Paul K CHU

    2004-01-01

    Plasma immersion ion implantation and deposition (PⅢ&D) has been shown to be an effective technique to enhance the surface bioactivity of materials. In this paper, recent progress made in our laboratory on plasma surface modification single-crystal silicon and amorphous carbon is reviewed. Silicon is the most important material in the integrated circuit industry but its surface biocompatibility has not been investigated in details. We have recently performed hydrogen PⅢ into silicon and observed the biomimetic growth of apatite on its surface in simulated body fluid. Diamond-like carbon (DLC) is widely used in the industry due to its excellent mechanical properties and chemical inertness. The use of this material in biomedical engineering has also attracted much attention. It has been observed in our laboratory that doping DLC with nitrogen by means of PⅢ can improve the surface blood compatibility. The properties as well as in vitro biological test results will be discussed in this article.

  12. Properties and application of hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Geiger, J.

    1985-04-12

    Hydrogenated amorphous silicon (a-Si:H) films have found increasing applications in the last few years, in particular for thin film solar cells. Efficiencies of around 10% have been achieved and the field is still rapidly developing. Three main methods are used to deposite a-Si:H, i.e. the decomposition of silane in a glow discharge, the reactive sputtering of silicon in an Ar-H2 atmosphere and the reactive evaporation of silicon in atomic hydrogen. The basic properties of the film, i.e. structure, electrical and photoelectrical properties and the density of states in the gap, are reviewed. Advantages and disadvantages of the three methods are discussed, also with regard to the applications. (orig.).

  13. Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth

    Energy Technology Data Exchange (ETDEWEB)

    Barbe, Jeremy, E-mail: jeremy.barbe@hotmail.com [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); Xie, Ling; Leifer, Klaus [Department of Engineering Sciences, Uppsala University, Box 534, S-751 21 Uppsala (Sweden); Faucherand, Pascal; Morin, Christine; Rapisarda, Dario; De Vito, Eric [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Makasheva, Kremena; Despax, Bernard [Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); CNRS, LAPLACE, F-31062 Toulouse (France); Perraud, Simon [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)

    2012-11-01

    The present study demonstrates the growth of silicon nanocrystals on amorphous silicon carbide alloy thin films. Amorphous silicon carbide films [a-Si{sub 1-x}C{sub x}:H (with x < 0.3)] were obtained by plasma enhanced chemical vapor deposition from a mixture of silane and methane diluted in hydrogen. The effect of varying the precursor gas-flow ratio on the film properties was investigated. In particular, a wide optical band gap (2.3 eV) was reached by using a high methane-to-silane flow ratio during the deposition of the a-Si{sub 1-x}C{sub x}:H layer. The effect of short-time annealing at 700 Degree-Sign C on the composition and properties of the layer was studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was observed that the silicon-to-carbon ratio in the layer remains unchanged after short-time annealing, but the reorganization of the film due to a large dehydrogenation leads to a higher density of SiC bonds. Moreover, the film remains amorphous after the performed short-time annealing. In a second part, it was shown that a high density (1 Multiplication-Sign 10{sup 12} cm{sup -2}) of silicon nanocrystals can be grown by low pressure chemical vapor deposition on a-Si{sub 0.8}C{sub 0.2} surfaces at 700 Degree-Sign C, from silane diluted in hydrogen. The influence of growth time and silane partial pressure on nanocrystals size and density was studied. It was also found that amorphous silicon carbide surfaces enhance silicon nanocrystal nucleation with respect to SiO{sub 2}, due to the differences in surface chemical properties. - Highlights: Black-Right-Pointing-Pointer Silicon nanocrystals (Si-NC) growth on amorphous silicon carbide alloy thin films Black-Right-Pointing-Pointer Plasma deposited amorphous silicon carbide films with well-controlled properties Black-Right-Pointing-Pointer Study on the thermal effect of 700 Degree-Sign C short-time annealing on the layer properties Black-Right-Pointing-Pointer Low pressure

  14. The U.S. and Japanese amorphous silicon technology programs A comparison

    Science.gov (United States)

    Shimada, K.

    1984-01-01

    The U.S. Department of Energy/Solar Energy Research Institute Amorphous Silicon (a-Si) Solar Cell Program performs R&D on thin-film hydrogenated amorphous silicon for eventual development of stable amorphous silicon cells with 12 percent efficiency by 1988. The Amorphous Silicon Solar Cell Program in Japan is sponsored by the Sunshine Project to develop an alternate energy technology. While the objectives of both programs are to eventually develop a-Si photovoltaic modules and arrays that would produce electricity to compete with utility electricity cost, the U.S. program approach is research oriented and the Japanese is development oriented.

  15. Grain boundary resistance to amorphization of nanocrystalline silicon carbide

    Science.gov (United States)

    Chen, Dong; Gao, Fei; Liu, Bo

    2015-11-01

    Under the C displacement condition, we have used molecular dynamics simulation to examine the effects of grain boundaries (GBs) on the amorphization of nanocrystalline silicon carbide (nc-SiC) by point defect accumulation. The results show that the interstitials are preferentially absorbed and accumulated at GBs that provide the sinks for defect annihilation at low doses, but also driving force to initiate amorphization in the nc-SiC at higher doses. The majority of surviving defects are C interstitials, as either C-Si or C-C dumbbells. The concentration of defect clusters increases with increasing dose, and their distributions are mainly observed along the GBs. Especially these small clusters can subsequently coalesce and form amorphous domains at the GBs during the accumulation of carbon defects. A comparison between displacement amorphized nc-SiC and melt-quenched single crystal SiC shows the similar topological features. At a dose of 0.55 displacements per atom (dpa), the pair correlation function lacks long range order, demonstrating that the nc-SiC is fully amorphilized.

  16. The Phase-1 upgrade of the CMS silicon pixel detector

    CERN Document Server

    Menichelli, Mauro

    2015-01-01

    The present CMS pixel detector will be replaced in the shutdown period 2016/17 by an upgraded version due to the following reasons: increased luminosity at reduced bunch spacing ( from 7 x 10 33 cm - 2 s - 1 at 50 ns bunch spacing to 2 x 10 34 cm - 2 s - 1 at 25 ns bunch spacing) in the LHC , and radiation damage effects that will significantly degrade the present detector. The new upgraded detector will have higher tracking efficiency and lower mass with four barrel layer and three forward/backward disks to provide higher hit pixel coverage out to pseudorapidities of ±2.5. In this paper we will describe the new pixel detector focus ing mostly on the barrel detector design, construction and expected performances

  17. Structure and Optical Properties of Silicon Nanocrystals Embedded in Amorphous Silicon Thin Films Obtained by PECVD

    Directory of Open Access Journals (Sweden)

    B. M. Monroy

    2011-01-01

    Full Text Available Silicon nanocrystals embedded in amorphous silicon matrix were obtained by plasma enhanced chemical vapor deposition using dichlorosilane as silicon precursor. The RF power and dichlorosilane to hydrogen flow rate ratio were varied to obtain different crystalline fractions and average sizes of silicon nanocrystals. High-resolution transmission electron microscopy images and RAMAN measurements confirmed the existence of nanocrystals embedded in the amorphous matrix with average sizes between 2 and 6 nm. Different crystalline fractions (from 12% to 54% can be achieved in these films by regulating the selected growth parameters. The global optical constants of the films were obtained by UV-visible transmittance measurements. Effective band gap variations from 1.78 to 2.3 eV were confirmed by Tauc plot method. Absorption coefficients higher than standard amorphous silicon were obtained in these thin films for specific growth parameters. The relationship between the optical properties is discussed in terms of the different internal nanostructures of the samples.

  18. Damage at hydrogenated amorphous/crystalline silicon interfaces by indium tin oxide overlayer sputtering

    OpenAIRE

    Demaurex, Bénédicte; De Wolf, Stefaan; Descoeudres, Antoine; Charles Holman, Zachary; Ballif, Christophe

    2012-01-01

    Damage of the hydrogenated amorphous/crystalline silicon interface passivation during transparent conductive oxide sputtering is reported. This occurs in the fabrication process of silicon heterojunction solar cells. We observe that this damage is at least partially caused by luminescence of the sputter plasma. Following low-temperature annealing, the electronic interface properties are recovered. However, the silicon-hydrogen configuration of the amorphous silicon film is permanently changed...

  19. Experiment and Simulation Study on the Amorphous Silicon Photovoltaic Walls

    OpenAIRE

    Wenjie Zhang; Bin Hao; Nianping Li

    2014-01-01

    Based on comparative study on two amorphous silicon photovoltaic walls (a-Si PV walls), the temperature distribution and the instant power were tested; and with EnergyPlus software, similar models of the walls were built to simulate annual power generation and air conditioning load. On typical sunshine day, the corresponding position temperature of nonventilated PV wall was generally 0.5~1.5°C higher than that of ventilated one, while the power generation was 0.2%~0.4% lower, which was consis...

  20. Ultralight amorphous silicon alloy photovoltaic modules for space applications

    Science.gov (United States)

    Hanak, J. J.; Chen, Englade; Fulton, C.; Myatt, A.; Woodyard, J. R.

    1987-01-01

    Ultralight and ultrathin, flexible, rollup monolithic PV modules have been developed consisting of multijunction, amorphous silicon alloys for either terrestrial or aerospace applications. The rate of progress in increasing conversion efficiency of stable multijunction and multigap PV cells indicates that arrays of these modules can be available for NASA's high power systems in the 1990's. Because of the extremely light module weight and the highly automated process of manufacture, the monolithic a-Si alloy arrays are expected to be strongly competitive with other systems for use in NASA's space station or in other large aerospace applications.

  1. Radiation damage and annealing of amorphous silicon solar cells

    Science.gov (United States)

    Byvik, C. E.; Slemp, W. S.; Smith, B. T.; Buoncristiani, A. M.

    1984-01-01

    Amorphous silicon solar cells were irradiated with 1 MeV electrons at the Space Environmental Effects Laboratory of the NASA Langley Research Center. The cells accumulated a total fluence of 10 to the 14th, 10 to the 15th, and 10 to the 16th electrons per square centimeter and exhibited increasing degradation with each irradiation. This degradation was tracked by evaluating the I-V curves for AM0 illumination and the relative spectral response. The observed radiation damage was reversed following an anneal of the cells under vacuum at 200 C for 2 hours.

  2. Study on stability of hydrogenated amorphous silicon films

    Institute of Scientific and Technical Information of China (English)

    Zhu Xiu-Hong; Chen Guang-Hua; Zhang Wen-Li; Ding Yi; Ma Zhan-Jie; Hu Yue-Hui; He Bin; Rong Yan-Dong

    2005-01-01

    Hydrogenated amorphous silicon (a-Si:H) films with high and same order of magnitude photosensitivity (~105) but different stability were prepared by using microwave electron cyclotron resonance chemical vapour deposition system under the different deposition conditions. It was proposed that there was no direct correlation between the photosensitivity and the hydrogen content (CH) as well as H-Si bonding configurations, but for the stability, they were the critical factors. The experimental results indicated that higher substrate temperature, hydrogen dilution ratio and lower deposition rate played an important role in improving the microstructure of a-Si:H films. We used hydrogen elimination model to explain our experimental results.

  3. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    OpenAIRE

    Jarolimek, K.; de Groot, R. A.; de Wijs, G. A.; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principles molecular-dynamics within density-functional theory the models were generated by cooling from the liquid. Where both models have a short-range order resembling that of crystalline Si3N4 because o...

  4. Two-Level Systems in Evaporated Amorphous Silicon

    OpenAIRE

    Queen, D. R.; Liu, X.; Karel, J.; Jacks, H. C.; Metcalf, T. H.; Hellman, F.

    2015-01-01

    In $e$-beam evaporated amorphous silicon ($a$-Si), the densities of two-level systems (TLS), $n_{0}$ and $\\overline{P}$, determined from specific heat $C$ and internal friction $Q^{-1}$ measurements, respectively, have been shown to vary by over three orders of magnitude. Here we show that $n_{0}$ and $\\overline{P}$ are proportional to each other with a constant of proportionality that is consistent with the measurement time dependence proposed by Black and Halperin and does not require the i...

  5. Eigenmode Splitting in all Hydrogenated Amorphous Silicon Nitride Coupled Microcavity

    Institute of Scientific and Technical Information of China (English)

    ZHANG Xian-Gao; HUANG Xin-Fan; CHEN Kun-Ji; QIAN Bo; CHEN San; DING Hong-Lin; LIU Sui; WANG Xiang; XU Jun; LI Wei

    2008-01-01

    Hydrogenated amorphous silicon nitride based coupled optical microcavity is investigated theoretically and experimentally. The theoretical calculation of the transmittance spectra of optical microcavity with one cavity and coupled microcavity with two-cavity is performed.The optical eigenmode splitting for coupled microcavity is found due to the interaction between the neighbouring localized cavities.Experimentally,the coupled cavity samples are prepared by plasma enhanced chemical vapour deposition and characterized by photoluminescence measurements.It is found that the photoluminescence peak wavelength agrees well with the cavity mode in the calculated transmittance spectra.This eigenmode splitting is analogous to the electron state energy splitting in diatom molecules.

  6. Diffusion length measurements of thin amorphous silicon layers

    Science.gov (United States)

    van den Heuvel, J. C.; van Oort, R. C.; Geerts, M. J.

    1989-02-01

    A new method for the analysis of diffusion length measurements by the Surface Photovoltage (SPV) method is presented. It takes into account the effect of the reflection of light from the back contact in thin layers and the effect of a finite bandwidth of the used interference filters. The model was found to agree with experiments on thin amorphous silicon (a-Si:H) layers. It is shown that in the region were these effects are negligible this method is equivalent to the standard method.

  7. INFRARED VIBRATIONAL SPECTRA OF CHLORINATED AND HYDROGENATED AMORPHOUS SILICON

    OpenAIRE

    Kalem, S; Chevallier, J.; Al Dallal, S.; Bourneix, J.

    1981-01-01

    The infrared spectra of chlorinated and hydrogenated amorphous silicon have been measured. In addition to the hydrogen induced bands at 2110, 1990, 885, 840 and 640 cm-1, we observe two new modes at 545 cm-1 (Si-Cl stretching) and 500 cm-1 ( Si TO modes induced by chlorine). Observation of the 545 cm-1 band proves that chlorine acts as a dangling bond terminator. Upon annealing, some of the Si-Cl groups transform into SiCl4 molecules (SiCl4 stretching at 615 cm-1). A good agreement is found b...

  8. Role of localized states in amorphous silicon tunnel barriers

    International Nuclear Information System (INIS)

    Results of an experimental study of the role of localized states in amorphous silicon tunneling barriers are reported. Composite barriers formed of multilayers of SiOx and a-Si, the latter containing a known density of localized states, have been developed in which the dominant tunneling mechanism can be made to be either direct or resonant tunneling. The effect of these localized states on the behavior of the conductance with barrier thickness, and on the superconducting tunneling current-voltage characteristics, is described

  9. A structural study of CN treated amorphous silicon

    Science.gov (United States)

    Yamazaki, Yuji; Shirai, Koun; Katayama-Yoshida, Hiroshi

    2003-06-01

    Recently, a remarkable technique to overcome the problem of light-induced degradation in amorphous silicon (a-Si) solar cells using a cyanide (CN) treatment has been developed. Structural and bonding characteristics of CN in a-Si has been studied using ab initio molecular dynamics simulations. It was found that CN incorporation results in more than just the termination of dangling bonds. The connectivity of the covalent random network increases because the CN changes from triply bonded, which is a common form in molecular CN, to the singly bonded form. This may be the mechanism by which CN incorporation produces significant reductions in light-induced degradation.

  10. Elimination of residual stress in hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Jones, P.L.; Korhonen, A.S.; Dimmey, L.J.; Cocks, F.H.; Pollock, J.T.A.

    1982-02-01

    Residual stresses were measured in hydrogenated amorphous silicon films produced by glow discharge decomposition of silane and deposited onto aluminium, Invar (36Ni-64Fe), copper and nickel substrates. The substrate temperatures were in the range 54-295/sup 0/C during deposition. For low deposition temperatures, all films irrespective of substrate exhibited compressive room temperature residual stresses ranging from -60 to -120 mPa. A major fraction of this residual stress is found to come from the intrinsic deposition stress, which has complex origins relating to deposition and substrate conditions. With aluminium substrates, increasing the deposition temperature increased the compressive residual stress, primarily because of the difference between the thermal expansion coefficients of silicon and aluminium. However, with Invar substrates, films deposited at 225/sup 0/C exhibited a zero residual stress at room temperature because of a balancing of the compressive intrinsic deposition stress with the tensile stress produced during cooling by the low thermal expansion of the Invar.

  11. Lithium concentration dependent structure and mechanics of amorphous silicon

    Science.gov (United States)

    Sitinamaluwa, H. S.; Wang, M. C.; Will, G.; Senadeera, W.; Zhang, S.; Yan, C.

    2016-06-01

    A better understanding of lithium-silicon alloying mechanisms and associated mechanical behavior is essential for the design of Si-based electrodes for Li-ion batteries. Unfortunately, the relationship between the dynamic mechanical response and microstructure evolution during lithiation and delithiation has not been well understood. We use molecular dynamic simulations to investigate lithiated amorphous silicon with a focus to the evolution of its microstructure, phase composition, and stress generation. The results show that the formation of LixSi alloy phase is via different mechanisms, depending on Li concentration. In these alloy phases, the increase in Li concentration results in reduction of modulus of elasticity and fracture strength but increase in ductility in tension. For a LixSi system with uniform Li distribution, volume change induced stress is well below the fracture strength in tension.

  12. Uncooled amorphous silicon IRFPA for high performance and high volume applications

    Science.gov (United States)

    Pochic, D.; Durand, A.; Tissot, J. L.; Crastes, A.; Vilain, M.; Legras, O.; Tinnes, S.; Minassian, C.; Robert, P.

    2009-09-01

    For more than 10 years now, uncooled sensors have given new opportunities in the IR field of applications by being able to be produce in large volume. Compared to cooled technology, uncooled detectors offer many interesting advantages: high reliability, lower cost ... whereas the performance is high enough for a lot of applications. Thermography, building inspection, enhanced driver vision and military (thermal weapon sight, low altitude UAV sensor) are applications which can be provided with affordable IR focal plane arrays... As uncooled IR sensors are mainly dedicated to these high volume applications, any uncooled IRFPA technology has to be able to provide high performance sensors but also to be producible in large volume at a minimum cost. The high level of accumulated expertise by ULIS and CEA/LETI on uncooled microbolometers made from amorphous silicon layer enables ULIS to develop a full range of IRFPA formats from 160x120 to 1024x768 pixels with 25μm and 17μm pixel-pitch, designed for high end and high volume applications. The detector ROIC designs rely on a simple architecture (detector configuration addressed by a serial link for user defined amplifier gain, windowing capability...) which enables easier systems upgrade and therefore a reduced system development non recurrent cost. The packaging technique depends on the application environment and the production volume in order to fit with the market expectation. Starting from metallic and ceramics package, very advanced new technique is under development in order to reduce uncooled IRFPA production cost. NETD in the range of 30mK (f/1, 300K, 60Hz) as well as operability higher than 99.99%, are routinely achieved with amorphous silicon technology.

  13. Beam test results of the BTeV silicon pixel detector

    Energy Technology Data Exchange (ETDEWEB)

    Gabriele Chiodini et al.

    2000-09-28

    The authors have described the results of the BTeV silicon pixel detector beam test. The pixel detectors under test used samples of the first two generations of Fermilab pixel readout chips, FPIX0 and FPIX1, (indium bump-bonded to ATLAS sensor prototypes). The spatial resolution achieved using analog charge information is excellent for a large range of track inclination. The resolution is still very good using only 2-bit charge information. A relatively small dependence of the resolution on bias voltage is observed. The resolution is observed to depend dramatically on the discriminator threshold, and it deteriorates rapidly for threshold above 4000e{sup {minus}}.

  14. Test Results on the Silicon Pixel Detector for the TTF-FEL Beam Trajectory Monitor

    OpenAIRE

    Hillert, S.; Ischebeck, R.; Müller, U. C.; Roth, S.; Hansen, K.; Holl, P.; Karstensen, S.; Kemmer, J.; Klanner, R.; Lechner, P.; Leenen, M; Ng, J. S. T.; Schmüser, P.; Strüder, L.

    2000-01-01

    Test measurements on the silicon pixel detector for the beam trajectory monitor at the free electron laser of the TESLA test facility are presented. To determine the electronic noise of detector and read-out and to calibrate the signal amplitude of different pixels the 6 keV photons of the manganese K line are used. Two different methods determine the spatial accuracy of the detector: In one setup a laser beam is focused to a straight line and moved across the pixel structure. In the other th...

  15. Geometric photovoltaics applied to amorphous silicon thin film solar cells

    Science.gov (United States)

    Kirkpatrick, Timothy

    Geometrically generalized analytical expressions for device transport are derived from first principles for a photovoltaic junction. Subsequently, conventional planar and unconventional coaxial and hemispherical photovoltaic architectures are applied to detail the device physics of the junction based on their respective geometry. For the conventional planar cell, the one-dimensional transport equations governing carrier dynamics are recovered. For the unconventional coaxial and hemispherical junction designs, new multi-dimensional transport equations are revealed. Physical effects such as carrier generation and recombination are compared for each cell architecture, providing insight as to how non-planar junctions may potentially enable greater energy conversion efficiencies. Numerical simulations are performed for arrays of vertically aligned, nanostructured coaxial and hemispherical amorphous silicon solar cells and results are compared to those from simulations performed for the standard planar junction. Results indicate that fundamental physical changes in the spatial dependence of the energy band profile across the intrinsic region of an amorphous silicon p-i-n junction manifest as an increase in recombination current for non-planar photovoltaic architectures. Despite an increase in recombination current, however, the coaxial architecture still appears to be able to surpass the efficiency predicted for the planar geometry, due to the geometry of the junction leading to a decoupling of optics and electronics.

  16. Electrical characteristics of amorphous molybdenum-nickel contacts to silicon

    Science.gov (United States)

    Kung, K. T.-Y.; Nicolet, M.-A.; Suni, I.

    1984-01-01

    The electrical characteristics of sputtered, amorphous Mo-Ni contacts have been measured on both p- and n-type Si, as functions of composition (30, 54, and 58 at. percent Mo). The contact resistivity on both p(+) and n(+) Si is in the 0.00000 ohm sq cm range. The barrier height for as-deposited samples varies between phi-bp = 0.47-0.42 V on p-type Si and between phi-bn = 0.63-0.68 V on n-type Si, as the composition of the amorphous layer goes from Ni-rich to Mo-rich. The sum phi-bp + phi-bn always equals 1.12 V, within experimental error. After thermal treatment at 500 C for 1/2 h, the contact resistivity changes by a factor of two or less, while the barrier height changes by at most approximately 0.05 V. In light of these results, the amorphous Mo-Ni film makes good ohmic contacts to silicon.

  17. Theory of structural transformation in lithiated amorphous silicon.

    Science.gov (United States)

    Cubuk, Ekin D; Kaxiras, Efthimios

    2014-07-01

    Determining structural transformations in amorphous solids is challenging due to the paucity of structural signatures. The effect of the transitions on the properties of the solid can be significant and important for applications. Moreover, such transitions may not be discernible in the behavior of the total energy or the volume of the solid as a function of the variables that identify its phases. These issues arise in the context of lithiation of amorphous silicon (a-Si), a promising anode material for high-energy density batteries based on lithium ions. Recent experiments suggest the surprising result that the lithiation of a-Si is a two-phase process. Here, we present first-principles calculations of the structure of a-Si at different lithiation levels. Through a detailed analysis of the short and medium-range properties of the amorphous network, using Voronoi-Delaunay methods and ring statistics, we show that a-LixSi has a fundamentally different structure below and above a lithiation level corresponding to x ∼ 2. PMID:24911996

  18. Experimental and Computer Modelling Studies of Metastability of Amorphous Silicon Based Solar Cells

    NARCIS (Netherlands)

    Munyeme, Geoffrey

    2003-01-01

    We present a combination of experimental and computer modelling studies of the light induced degradation in the performance of amorphous silicon based single junction solar cells. Of particular interest in this study is the degradation kinetics of different types of amorphous silicon single junction

  19. High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.

    Science.gov (United States)

    He, Rongrui; Day, Todd D; Sparks, Justin R; Sullivan, Nichole F; Badding, John V

    2016-07-01

    Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors. PMID:27174318

  20. Design of a prototype microchannel plate detector with cooled amorphous silicon array readout for neutron radiography

    International Nuclear Information System (INIS)

    High-performance large-area imaging detectors for fast neutrons in the 5-14 MeV energy range do not exist at present. The aim of this project is to combine microchannel plates or MCPs (or similar electron multiplication structures) traditionally used in image intensifiers and X-ray detectors with amorphous silicon pixel arrays to produce a composite converter and intensifier position-sensitive imaging system. This detector will provide an order of magnitude improvement in image resolution when compared with current millimetre resolution limits obtained using phosphor- or scintillator-based hydrogen-rich converters. In this study the detection of fast neutrons is based on neutron capture in silicon rather than proton recoil in hydrogen-rich converters. This will reduce the effect that light spreading has on image resolution when using conventional phosphor-based converters. The threshold in the silicon capture cross-section will reduce the effect of neutron scatter on the detectability of small features in fast neutron radiographs. In this study we highlight the prototype detector design, present its main advantages and the current status of the detector build phase

  1. Highly featured amorphous silicon nanorod arrays for high-performance lithium-ion batteries

    Energy Technology Data Exchange (ETDEWEB)

    Soleimani-Amiri, Samaneh; Safiabadi Tali, Seied Ali; Azimi, Soheil; Sanaee, Zeinab; Mohajerzadeh, Shamsoddin, E-mail: mohajer@ut.ac.ir [Thin Film and Nanoelectronics Lab, Nanoelectronics Center of Excellence, School of Electrical and Computer Engineering, University of Tehran, Tehran 143957131 (Iran, Islamic Republic of)

    2014-11-10

    High aspect-ratio vertical structures of amorphous silicon have been realized using hydrogen-assisted low-density plasma reactive ion etching. Amorphous silicon layers with the thicknesses ranging from 0.5 to 10 μm were deposited using radio frequency plasma enhanced chemical vapor deposition technique. Standard photolithography and nanosphere colloidal lithography were employed to realize ultra-small features of the amorphous silicon. The performance of the patterned amorphous silicon structures as a lithium-ion battery electrode was investigated using galvanostatic charge-discharge tests. The patterned structures showed a superior Li-ion battery performance compared to planar amorphous silicon. Such structures are suitable for high current Li-ion battery applications such as electric vehicles.

  2. Highly featured amorphous silicon nanorod arrays for high-performance lithium-ion batteries

    International Nuclear Information System (INIS)

    High aspect-ratio vertical structures of amorphous silicon have been realized using hydrogen-assisted low-density plasma reactive ion etching. Amorphous silicon layers with the thicknesses ranging from 0.5 to 10 μm were deposited using radio frequency plasma enhanced chemical vapor deposition technique. Standard photolithography and nanosphere colloidal lithography were employed to realize ultra-small features of the amorphous silicon. The performance of the patterned amorphous silicon structures as a lithium-ion battery electrode was investigated using galvanostatic charge-discharge tests. The patterned structures showed a superior Li-ion battery performance compared to planar amorphous silicon. Such structures are suitable for high current Li-ion battery applications such as electric vehicles

  3. Amorphous structures of silicon carbonitride formed by high-dose nitrogen ion implantation into silicon carbide

    International Nuclear Information System (INIS)

    Short-range order in amorphous silicon carbonitride (a-SiCxNy) has been examined using transmission electron microscopy. Single crystals of 6H-SiC with [0 0 0 1] orientation were implanted with 180 keV nitrogen ions at ambient temperature to a fluence of 5 x 1017 N+/cm2, followed by thermally annealing at 1500 deg. C for 30 min. A fully amorphous layer was formed at the topmost layer in the as-implanted sample. A part of the amorphous phase transformed into crystalline SiC after annealing. Radial distribution functions extracted via nano-beam electron diffraction patterns clearly showed that atomistic structures of the ion-beam-induced amorphous phase are different from those of the remaining amorphous phase in the annealed sample: a-SiCxNy possesses an intermediate bond length between Si-C and Si-N, while Si-N and Si-C bonds become more pronounced in the amorphous layer of the annealed specimen

  4. First principles simulation of amorphous silicon bulk, interfaces, and nanowires for photovoltaics

    OpenAIRE

    Belayneh, Merid Legesse

    2015-01-01

    Amorphous silicon has become the material of choice for many technologies, with major applications in large area electronics: displays, image sensing and thin film photovoltaic cells. This technology development has occurred because amorphous silicon is a thin film semiconductor that can be deposited on large, low cost substrates using low temperature. In this thesis, classical molecular dynamics and first principles DFT calculations have been performed to generate structural models of amorph...

  5. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

    Directory of Open Access Journals (Sweden)

    Jia Ge

    2014-01-01

    Full Text Available We present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells, in this paper. The deposition of hydrogenated intrinsic amorphous silicon suboxide is accomplished by decomposing hydrogen, silane, and carbon dioxide in an industrial remote inductively coupled plasma platform. Through the investigation on CO2 partial pressure and process temperature, excellent surface passivation quality and optical properties are achieved. It is found that the hydrogen content in the film is much higher than what is commonly reported in intrinsic amorphous silicon due to oxygen incorporation. The observed slow depletion of hydrogen with increasing temperature greatly enhances its process window as well. The effective lifetime of symmetrically passivated samples under the optimal condition exceeds 4.7 ms on planar n-type Czochralski silicon wafers with a resistivity of 1 Ωcm, which is equivalent to an effective surface recombination velocity of less than 1.7 cms−1 and an implied open-circuit voltage (Voc of 741 mV. A comparison with several high quality passivation schemes for solar cells reveals that the developed inductively coupled plasma deposited films show excellent passivation quality. The excellent optical property and resistance to degradation make it an excellent substitute for industrial heterojunction silicon solar cell production.

  6. DAQ Development for Silicon-On-Insulator Pixel detectors

    CERN Document Server

    Nishimura, Ryutaro; Miyoshi, Toshinobu

    2015-01-01

    We are developing DAQ for Si-pixel detectors by using a Slicon-On-Insulator (SOI) technology. This DAQ consists of firmware works on SEABAS (Soi EvAluation BoArd with Sitcp) DAQ board and software works on PC. We have been working on the development of firmware/software. Now we accomplished to speed up the readout (~90Hz) and to add a function for frame rate control. This is the report of our development work for the High Speed DAQ system.

  7. Effect of amorphous silicon carbide layer thickness on the passivation quality of crystalline silicon surface

    OpenAIRE

    Ferré Tomas, Rafel; Martín García, Isidro; Vetter, Michael; Garin Escriva, Moises; Alcubilla González, Ramón

    2005-01-01

    Surface passivation of p-type crystalline silicon wafers by means of phosphorus-doped hydrogenated amorphous silicon carbide films [a-SiCx(n):H] has been investigated. Particularly, we focused on the effects of layer thickness on the c-Si surface passivation quality resulting in the determination of the fixed charge density, Qf, within the a-SiCx(n):H film and the fundamental recombination of holes, Sp0. The main result is that surface recombination velocity decreases with film...

  8. Operating characteristics of radiation-hardened silicon pixel detectors for the CMS experiment

    CERN Document Server

    Hyosung, Cho

    2002-01-01

    The Compact Muon Solenoid (CMS) experiment at the CERN Large Hadron Collider (LHC) will have forward silicon pixel detectors as its innermost tracking device. The pixel devices will be exposed to the harsh radiation environment of the LHC. Prototype silicon pixel detectors have been designed to meet the specification of the CMS experiment. No guard ring is required on the n/sup +/ side, and guard rings on the p/sup +/ side are always kept active before and after type inversion. The whole n/sup +/ side is grounded and connected to readout chips, which greatly simplifies detector assembling and improves the stability of bump-bonded readout chips on the n/sup +/ side. Operating characteristics such as the leakage current, the full depletion voltage, and the potential distributions over guard rings were tested using standard techniques. The tests are discussed in this paper. (9 refs).

  9. Modelling structure and properties of amorphous silicon boron nitride ceramics

    Directory of Open Access Journals (Sweden)

    Johann Christian Schön

    2011-06-01

    Full Text Available Silicon boron nitride is the parent compound of a new class of high-temperature stable amorphous ceramics constituted of silicon, boron, nitrogen, and carbon, featuring a set of properties that is without precedent, and represents a prototypical random network based on chemical bonds of predominantly covalent character. In contrast to many other amorphous materials of technological interest, a-Si3B3N7 is not produced via glass formation, i.e. by quenching from a melt, the reason being that the binary components, BN and Si3N4, melt incongruently under standard conditions. Neither has it been possible to employ sintering of μm-size powders consisting of binary nitrides BN and Si3N4. Instead, one employs the so-called sol-gel route starting from single component precursors such as TADB ((SiCl3NH(BCl2. In order to determine the atomic structure of this material, it has proven necessary to simulate the actual synthesis route.Many of the exciting properties of these ceramics are closely connected to the details of their amorphous structure. To clarify this structure, it is necessary to employ not only experimental probes on many length scales (X-ray, neutron- and electron scattering; complex NMR experiments; IR- and Raman scattering, but also theoretical approaches. These address the actual synthesis route to a-Si3B3N7, the structural properties, the elastic and vibrational properties, aging and coarsening behaviour, thermal conductivity and the metastable phase diagram both for a-Si3B3N7 and possible silicon boron nitride phases with compositions different from Si3N4: BN = 1 : 3. Here, we present a short comprehensive overview over the insights gained using molecular dynamics and Monte Carlo simulations to explore the energy landscape of a-Si3B3N7, model the actual synthesis route and compute static and transport properties of a-Si3BN7.

  10. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    OpenAIRE

    Jarmila Mullerova

    2006-01-01

    IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVD on glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silane plasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra of hydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. In this paper, addit...

  11. Calorimetry of dehydrogenation and dangling-bond recombination in several hydrogenated amorphous silicon materials

    OpenAIRE

    Roura Grabulosa, Pere; Farjas Silva, Jordi; Rath, Chandana; Serra-Miralles, J.; Bertrán Serra, Enric; Roca I Cabarrocas, Pere

    2006-01-01

    Differential scanning calorimetry (DSC) was used to study the dehydrogenation processes that take place in three hydrogenated amorphous silicon materials: nanoparticles, polymorphous silicon, and conventional device-quality amorphous silicon. Comparison of DSC thermograms with evolved gas analysis (EGA) has led to the identification of four dehydrogenation processes arising from polymeric chains (A), SiH groups at the surfaces of internal voids (A'), SiH groups at interfaces (B), and in the b...

  12. The influence of post-deposition annealing upon amorphous silicon/crystalline silicon heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Mikolášek, Miroslav, E-mail: miroslav.mikolasek@stuba.sk [Slovak University of Technology, Faculty of Electrical Engineering and Information Technology, Ilkovičova 3, 812 19 Bratislava (Slovakia); Nemec, Michal; Kováč, Jaroslav [Slovak University of Technology, Faculty of Electrical Engineering and Information Technology, Ilkovičova 3, 812 19 Bratislava (Slovakia); Foti, Marina; Gerardi, Cosimo [IMS-R and D, STMicroelectronics, Stradale Primosole, 50, 95121 Catania (Italy); Mannino, Giovanni; Valenti, Luca; Lombardo, Salvatore [CNR-IMM, Zona Industriale, Ottava Strada, 5, 95121 Catania (Italy)

    2014-11-15

    Highlights: • We studied the impact of the thermal annealing on the silicon heterojunction solar cells. • Compared were samples deposited by ICP-CVD and PE-CVD methods. • Annealing up to 250 °C improves output performance of both solar cells. • Annealing above 250 °C increases defect states density at the interface and in the amorphous emitter. • Samples deposited by ICP-CVD shows better resistance against annealing. - Abstract: This paper presents a comparative study of the influence of post-deposition annealing on amorphous silicon/crystalline silicon heterojunction solar cells deposited by ICP-CVD and PE-CVD techniques. Two major effects on the solar cell efficiency occur caused by thermal annealing. The first effect is a slight improvement of the performance on annealing up to 250 °C. The second effect, for annealing temperatures above 250 °C, reveals deterioration of the solar cell performance. It is suggested that both effects are related to thermally activated diffusion of hydrogen. For low annealing temperatures, diffusion of weakly bonded hydrogen allows to passivate the defects in the amorphous emitter and at the heterointerface. In the high temperature annealing region, outdiffusion of hydrogen is assumed to be responsible for an increase of defect states in the structures. The results indicate a better stability after high temperature treatment for the sample prepared by ICP-CVD technology.

  13. Hydrogenated Amorphous Silicon Sensor Deposited on Integrated Circuit for Radiation Detection

    CERN Document Server

    Despeisse, M; Jarron, P; Kaplon, J; Moraes, D; Nardulli, A; Powolny, F; Wyrsch, N

    2008-01-01

    Radiation detectors based on the deposition of a 10 to 30 mum thick hydrogenated amorphous silicon (a-Si:H) sensor directly on top of integrated circuits have been developed. The performance of this detector technology has been assessed for the first time in the context of particle detectors. Three different circuits were designed in a quarter micron CMOS technology for these studies. The so-called TFA (Thin-Film on ASIC) detectors obtained after deposition of a-Si:H sensors on the developed circuits are presented. High internal electric fields (104 to 105 V/cm) can be built in the a-Si:H sensor and overcome the low mobility of electrons and holes in this amorphous material. However, the deposited sensor's leakage current at such fields turns out to be an important parameter which limits the performance of a TFA detector. Its detailed study is presented as well as the detector's pixel segmentation. Signal induction by generated free carrier motion in the a-Si:H sensor has been characterized using a 660 nm pul...

  14. Pre- and post-irradiation performance of FBK 3D silicon pixel detectors for CMS

    Energy Technology Data Exchange (ETDEWEB)

    Krzywda, A., E-mail: akrzywda@purdue.edu [Purdue University, Department of Physics and Astronomy, West Lafayette, IN 47907-2036 (United States); Alagoz, E.; Bubna, M. [Purdue University, Department of Physics and Astronomy, West Lafayette, IN 47907-2036 (United States); Obertino, M. [Università del Piemonte Orientale, Novara (Italy); INFN, Sezione di Torino, Torino (Italy); Solano, A. [Università di Torino, Torino (Italy); INFN, Sezione di Torino, Torino (Italy); Arndt, K. [Purdue University, Department of Physics and Astronomy, West Lafayette, IN 47907-2036 (United States); Uplegger, L. [Fermi National Accelerator Laboratory, Batavia, IL 60510-5011 (United States); Betta, G.F. Dalla [TIFPA INFN and Dipartimento di Ingegneria Industriale, Università di Trento, Via Sommarive 9, I-38123 Povo di Trento, TN (Italy); Boscardin, M. [Centro per Materiali e i Microsistemi Fondazione Bruno Kessler (FBK), Trento, Via Sommarive 18, I-38123 Povo di Trento, TN (Italy); Ngadiuba, J. [Università di Milano-Bicocca, Milan (Italy); Rivera, R. [Fermi National Accelerator Laboratory, Batavia, IL 60510-5011 (United States); Menasce, D.; Moroni, L.; Terzo, S. [Università di Milano-Bicocca, Milan (Italy); Bortoletto, D. [Purdue University, Department of Physics and Astronomy, West Lafayette, IN 47907-2036 (United States); Prosser, A.; Adreson, J.; Kwan, S. [Fermi National Accelerator Laboratory, Batavia, IL 60510-5011 (United States); Osipenkov, I. [Texas A and M University, Department of Physics, College Station, TX 77843 (United States); Bolla, G. [Purdue University, Department of Physics and Astronomy, West Lafayette, IN 47907-2036 (United States); and others

    2014-11-01

    In preparation for the tenfold luminosity upgrade of the Large Hadron Collider (the HL-LHC) around 2020, three-dimensional (3D) silicon pixel sensors are being developed as a radiation-hard candidate to replace the planar ones currently being used in the CMS pixel detector. This study examines an early batch of FBK sensors (named ATLAS08) of three 3D pixel geometries: 1E, 2E, and 4E, which respectively contain one, two, and four readout electrodes for each pixel, passing completely through the bulk. We present electrical characteristics and beam test performance results for each detector before and after irradiation. The maximum fluence applied is 3.5×10{sup 15} n {sub eq}/cm{sup 2}.

  15. Thin pixel development for the SuperB silicon vertex tracker

    International Nuclear Information System (INIS)

    The high luminosity SuperB asymmetric e+e- collider, to be built near the INFN National Frascati Laboratory in Italy, has been designed to deliver a luminosity greater than 1036 cm-2 s-1 with moderate beam currents and a reduced center of mass boost with respect to earlier B-Factories. An improved vertex resolution is required for precise time-dependent measurements and the SuperB Silicon Vertex Tracker will be equipped with an innermost layer of small radius (about 1.5 cm), resolution of 10-15μm in both coordinates, low material budget (2. The ambitious goal of designing a thin pixel device with these stringent requirements is being pursued with specific R and D programs on different technologies: hybrid pixels, CMOS MAPS and pixel sensors developed with vertical integration technology. The latest results on the various pixel options for the SuperB SVT will be presented.

  16. A hybrid silicon pixel telescope tested in a heavy-ion experiment

    International Nuclear Information System (INIS)

    Specific features of the OMEGA-ION pixel detector are the adjustable delay with external trigger capability and the detector leakage current compensation. A row of pixels can be used for testing the electrical performance of the amplifier and comparator circuits. Detailed results of these electrical tests are presented. A telescope made of three OMEGA-ION hybrid silicon pixel detectors has been successfully tested in the heavy-ion experiment WA94. Each plane consisted of a single detector with 1006 active pixels (500 μm x 75 μm), each one being bump-bonded to the readout chip, and arranged in 16 columns and 63 rows respectively. With a sensitive area as small as 8000x4725 μm2 several million events with at least one track originating from the sulphur-sulphur interaction have been recorded in a few hours. Results on target reconstruction, tracking accuracy and efficiency are presented. (orig.)

  17. Silicon micro-fluidic cooling for NA62 GTK pixel detectors

    CERN Document Server

    Romagnoli, G; Brunel, B; Catinaccio, A; Degrange, J; Mapelli, A; Morel, M; Noel, J; Petagna, P

    2015-01-01

    Silicon micro-channel cooling is being studied for efficient thermal management in application fields such as high power computing and 3D electronic integration. This concept has been introduced in 2010 for the thermal management of silicon pixel detectors in high energy physics experiments. Combining the versatility of standard micro-fabrication processes with the high thermal efficiency typical of micro-fluidics, it is possible to produce effective thermal management devices that are well adapted to different detector configurations. The production of very thin cooling devices in silicon enables a minimization of material of the tracking sensors and eliminates mechanical stresses due to the mismatch of the coefficient of thermal expansion between detectors and cooling systems. The NA62 experiment at CERN will be the first high particle physics experiment that will install a micro-cooling system to perform the thermal management of the three detection planes of its Gigatracker pixel detector.

  18. Properties of interfaces in amorphous/crystalline silicon heterojunctions

    Energy Technology Data Exchange (ETDEWEB)

    Olibet, Sara; Vallat-Sauvain, Evelyne; Fesquet, Luc; Damon-Lacoste, Jerome; De Wolf, Stefaan; Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), IMT, Photovoltaics and Thin Film Electronics Laboratory, Breguet 2, 2000 Neuchatel (Switzerland); Monachon, Christian; Hessler-Wyser, Aicha [Ecole Polytechnique Federale de Lausanne (EPFL), Interdisciplinary Centre for Electron Microscopy (CIME), 1015 Lausanne (Switzerland)

    2010-03-15

    To study recombination at the amorphous/crystalline Si (a-Si:H/c-Si) heterointerface, the amphoteric nature of silicon (Si) dangling bonds is taken into account. Modeling interface recombination measured on various test structures provides insight into the microscopic passivation mechanisms, yielding an excellent interface defect density reduction by intrinsic a-Si:H and tunable field-effect passivation by doped layers. The potential of this model's applicability to recombination at other Si heterointerfaces is demonstrated. Solar cell properties of a-Si:H/c-Si heterojunctions are in good accordance with the microscopic interface properties revealed by modeling, that are, e.g., slight asymmetries in the neutral capture cross-sections and band offsets. The importance of atomically abrupt interfaces and the difficulties to obtain them on pyramidally textured c-Si is studied in combination with transmission electron microscopy. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  19. Si-H bond dynamics in hydrogenated amorphous silicon

    Science.gov (United States)

    Scharff, R. Jason; McGrane, Shawn D.

    2007-08-01

    The ultrafast structural dynamics of the Si-H bond in the rigid solvent environment of an amorphous silicon thin film is investigated using two-dimensional infrared four-wave mixing techniques. The two-dimensional infrared (2DIR) vibrational correlation spectrum resolves the homogeneous line shapes ( 4ps waiting times. The Si-H stretching mode anharmonic shift is determined to be 84cm-1 and decreases slightly with vibrational frequency. The 1→2 linewidth increases with vibrational frequency. Frequency dependent vibrational population times measured by transient grating spectroscopy are also reported. The narrow homogeneous line shape, large inhomogeneous broadening, and lack of spectral diffusion reported here present the ideal backdrop for using a 2DIR probe following electronic pumping to measure the transient structural dynamics implicated in the Staebler-Wronski degradation [Appl. Phys. Lett. 31, 292 (1977)] in a-Si:H based solar cells.

  20. Radiation Resistance Studies of Amorphous Silicon Alloy Photovoltaic Materials

    Science.gov (United States)

    Woodyard, James R.

    1994-01-01

    The radiation resistance of commercial solar cells fabricated from hydrogenated amorphous silicon alloys was investigated. A number of different device structures were irradiated with 1.0 MeV protons. The cells were insensitive to proton fluences below 1E12 sq cm. The parameters of the irradiated cells were restored with annealing at 200 C. The annealing time was dependent on proton fluence. Annealing devices for one hour restores cell parameters for fluences below lE14 sq cm require longer annealing times. A parametric fitting model was used to characterize current mechanisms observed in dark I-V measurements. The current mechanisms were explored with irradiation fluence, and voltage and light soaking times. The thermal generation current density and quality factor increased with proton fluence. Device simulation shows the degradation in cell characteristics may be explained by the reduction of the electric field in the intrinsic layer.

  1. Atomistic simulations of material damping in amorphous silicon nanoresonators

    Science.gov (United States)

    Mukherjee, Sankha; Song, Jun; Vengallatore, Srikar

    2016-06-01

    Atomistic simulations using molecular dynamics (MD) are emerging as a valuable tool for exploring dissipation and material damping in nanomechanical resonators. In this study, we used isothermal MD to simulate the dynamics of the longitudinal-mode oscillations of an amorphous silicon nanoresonator as a function of frequency (2 GHz–50 GHz) and temperature (15 K–300 K). Damping was characterized by computing the loss tangent with an estimated uncertainty of 7%. The dissipation spectrum displays a sharp peak at 50 K and a broad peak at around 160 K. Damping is a weak function of frequency at room temperature, and the loss tangent has a remarkably high value of ~0.01. In contrast, at low temperatures (15 K), the loss tangent increases monotonically from 4× {{10}-4} to 4× {{10}-3} as the frequency increases from 2 GHz to 50 GHz. The mechanisms of dissipation are discussed.

  2. Rapid Thermal annealing of silicon layers amorphized by ion implantation

    International Nuclear Information System (INIS)

    The recrystallization behavior and the supression mechanisms of the residual defects of silicon layers amorphized by ion implantation, were investigated. The samples were annealed with the aid of a rapid thermal annealing (RTA) system at temperature range from 850 to 12000C, and annealing time up to 120 s. Random and aligned Rutherford backscattering spectroscopy were used to analyse the samples. Similarities in the recrystallization behavior for layers implanted with ions of the same chemical groups such as As or Sb; Ge, Sn or Pb, In or Ga, are observed. The results show that the effective supression of resisual defects of the recrystallired layers is vinculated to the redistribution of impurities via thermal diffusion. (author)

  3. Optical limiting in hydrogenated amorphous silicon-selenium thin films

    Energy Technology Data Exchange (ETDEWEB)

    Manaa, Hacene, E-mail: hmanaa@gmail.co [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Mulla, Abdullah; Al-Jamal, Noor [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Dallal, Shawqi; Al-Alawi, Saleh [Physics Department, University of Bahrain, P.O. Box 32038 (Bahrain)

    2010-05-03

    Hydrogenated amorphous silicon-selenium alloy thin films grown by capacitively coupled radio-frequency glow-discharge are investigated. Nonlinear absorptive effects are evaluated with the help of open aperture z-scan technique in the 525 to 580 nm spectral range. The nonlinear absorption coefficient is found to be very large and reaching the value of 5.14 x 10{sup -3} cm/W at 525 nm. The origin of the optical nonlinearities is studied and found to be due mainly to two photon absorption in the case of pulsed excitation, whereas thermal effects are thought to be dominant when the sample is excited with a continuous wave laser. Optical limiting potentialities of the thin film are experimentally observed and their thresholds are found to be very low.

  4. Light-induced metastability in pure and hydrogenated amorphous silicon

    Science.gov (United States)

    Queen, D. R.; Liu, X.; Karel, J.; Wang, Q.; Crandall, R. S.; Metcalf, T. H.; Hellman, F.

    2015-10-01

    Light soaking is found to increase the specific heat C and internal friction Q-1 of pure (a-Si) and hydrogenated (a-Si:H) amorphous silicon. At the lowest temperatures, the increases in C and Q-1 are consistent with an increased density of two-level systems (TLS). The light-induced increase in C persists to room temperature. Neither the sound velocity nor shear modulus change with light soaking indicating that the Debye specific heat is unchanged which suggests that light soaking creates localized vibrational modes in addition to TLS. The increase can be reversibly added and removed by light soaking and annealing, respectively, suggesting that it is related to the Staebler-Wronski effect (SWE), even in a-Si without H, and involves a reversible nanoscale structural rearrangement that is facilitated by, but does not require, H to occur.

  5. Ion-beam-induced amorphous structures in silicon carbide

    International Nuclear Information System (INIS)

    Atomistic structure of ion-beam-induced amorphous silicon carbide (a-SiC) has been investigated by cross-sectional transmission electron microscopy. The electron intensities of halo patterns recorded on imaging plates were digitized quantitatively to extract reduced interference functions. We demonstrated the relationship between maximum scattering vector (Qmax) measured in scattering experiments and the resolution of the corresponding pair-distribution function by changing Qmax values from 160 to 230 nm-1. The results revealed that the C-C peak becomes broadened and eventually a shoulder as the Qmax value becomes shorter, indicating that Qmax values of -1 measured in previous studies are not enough to detect C-C homonuclear bonds in a-SiC. We are the first to reveal the existence of C-C and Si-Si homonuclear bonds in a-SiC using a diffraction technique

  6. Amorphous silicon thin film transistor active-matrix organic light-emitting diode displays fabricated on flexible substrates

    Science.gov (United States)

    Nichols, Jonathan A.

    Organic light-emitting diode (OLED) displays are of immense interest because they have several advantages over liquid crystal displays, the current dominant flat panel display technology. OLED displays are emissive and therefore are brighter, have a larger viewing angle, and do not require backlights and filters, allowing thinner, lighter, and more power efficient displays. The goal of this work was to advance the state-of-the-art in active-matrix OLED display technology. First, hydrogenated amorphous silicon (a-Si:H) thin film transistor (TFT) active-matrix OLED pixels and arrays were designed and fabricated on glass substrates. The devices operated at low voltages and demonstrated that lower performance TFTs could be utilized in active-matrix OLED displays, possibly allowing lower cost processing and the use of polymeric substrates. Attempts at designing more control into the display at the pixel level were also made. Bistable (one bit gray scale) active-matrix OLED pixels and arrays were designed and fabricated. Such pixels could be used in novel applications and eventually help reduce the bandwidth requirements in high-resolution and large-area displays. Finally, a-Si:H TFT active-matrix OLED pixels and arrays were fabricated on a polymeric substrate. Displays fabricated on a polymeric substrates would be lightweight; flexible, more rugged, and potentially less expensive to fabricate. Many of the difficulties associated with fabricating active-matrix backplanes on flexible substrates were studied and addressed.

  7. Environmental aspects and risks of amorphous silicon solar cells

    International Nuclear Information System (INIS)

    The aim of the study on the title subject is to identify potential bottlenecks for a number of (future) solar cell technologies and to formulate ensuing recommendations with regard to the photovoltaic (PV) research and development policy in the Netherlands. The potential environmental effects of amorphous silicon PV modules are investigated for their entire life cycle. For the life cycle assessment (LCA) the product life cycle is divided into a number of processes, each of which is described by the typical product input and output flow, secondary materials input, energy input, process yield, emissions to water and air, solid waste production and the output of reusable (secondary) materials. Regarding the development towards future (energy) technologies three possible technology cases are defined: a worst, a base and a best case.In order to facilitate the material flow accounting for LCA, a special LCA computer model has been developed in connection with a data base system, containing process descriptions. Also attention is paid to possible risks concerning occupational health and safety. The overall conclusion is that, from am environmental and from a risk point of view, no serious bottlenecks can be identified in the life cycle of amorphous silicon PV modules. Within these constraints this technology can be called sustainable, when the present developments persevere and the available safety practices will be incorporated in the production processes to a large degree. Recommendations are given for further research on the title subject to fill gaps in the knowledge of parameters of certain processes for PV modules. 5 figs., 20 tabs., 2 appendices, 74 refs

  8. Solid phase epitaxy of amorphous silicon carbide: Ion fluence dependence

    International Nuclear Information System (INIS)

    We have investigated the effect of radiation damage and impurity concentration on solid phase epitaxial growth of amorphous silicon carbide (SiC) as well as microstructures of recrystallized layer using transmission electron microscopy. Single crystals of 6H-SiC with (0001) orientation were irradiated with 150 keV Xe ions to fluences of 1015 and 1016/cm2, followed by annealing at 890 deg. C. Full epitaxial recrystallization took place in a specimen implanted with 1015 Xe ions, while retardation of recrystallization was observed in a specimen implanted with 1016/cm2 Xe ions. Atomic pair-distribution function analyses and energy dispersive x-ray spectroscopy results suggested that the retardation of recrystallization of the 1016 Xe/cm2 implanted sample is attributed to the difference in amorphous structures between the 1015 and 1016 Xe/cm2 implanted samples, i.e., more chemically disordered atomistic structure and higher Xe impurity concentration in the 1016 Xe/cm2 implanted sample

  9. Amorphous In–Ga–Zn–O thin-film transistor active pixel sensor x-ray imager for digital breast tomosynthesis

    International Nuclear Information System (INIS)

    Purpose: The breast cancer detection rate for digital breast tomosynthesis (DBT) is limited by the x-ray image quality. The limiting Nyquist frequency for current DBT systems is around 5 lp/mm, while the fine image details contained in the high spatial frequency region (>5 lp/mm) are lost. Also today the tomosynthesis patient dose is high (0.67–3.52 mGy). To address current issues, in this paper, for the first time, a high-resolution low-dose organic photodetector/amorphous In–Ga–Zn–O thin-film transistor (a-IGZO TFT) active pixel sensor (APS) x-ray imager is proposed for next generation DBT systems. Methods: The indirect x-ray detector is based on a combination of a novel low-cost organic photodiode (OPD) and a cesium iodide-based (CsI:Tl) scintillator. The proposed APS x-ray imager overcomes the difficulty of weak signal detection, when small pixel size and low exposure conditions are used, by an on-pixel signal amplification with a significant charge gain. The electrical performance of a-IGZO TFT APS pixel circuit is investigated by SPICE simulation using modified Rensselaer Polytechnic Institute amorphous silicon (a-Si:H) TFT model. Finally, the noise, detective quantum efficiency (DQE), and resolvability of the complete system are modeled using the cascaded system formalism. Results: The result demonstrates that a large charge gain of 31–122 is achieved for the proposed high-mobility (5–20 cm2/V s) amorphous metal-oxide TFT APS. The charge gain is sufficient to eliminate the TFT thermal noise, flicker noise as well as the external readout circuit noise. Moreover, the low TFT (<10−13 A) and OPD (<10−8 A/cm2) leakage currents can further reduce the APS noise. Cascaded system analysis shows that the proposed APS imager with a 75 μm pixel pitch can effectively resolve the Nyquist frequency of 6.67 lp/mm, which can be further improved to ∼10 lp/mm if the pixel pitch is reduced to 50 μm. Moreover, the detector entrance exposure per

  10. Amorphous In–Ga–Zn–O thin-film transistor active pixel sensor x-ray imager for digital breast tomosynthesis

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Chumin; Kanicki, Jerzy, E-mail: kanicki@eecs.umich.edu [Solid-State Electronic Laboratory, Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109 (United States)

    2014-09-15

    Purpose: The breast cancer detection rate for digital breast tomosynthesis (DBT) is limited by the x-ray image quality. The limiting Nyquist frequency for current DBT systems is around 5 lp/mm, while the fine image details contained in the high spatial frequency region (>5 lp/mm) are lost. Also today the tomosynthesis patient dose is high (0.67–3.52 mGy). To address current issues, in this paper, for the first time, a high-resolution low-dose organic photodetector/amorphous In–Ga–Zn–O thin-film transistor (a-IGZO TFT) active pixel sensor (APS) x-ray imager is proposed for next generation DBT systems. Methods: The indirect x-ray detector is based on a combination of a novel low-cost organic photodiode (OPD) and a cesium iodide-based (CsI:Tl) scintillator. The proposed APS x-ray imager overcomes the difficulty of weak signal detection, when small pixel size and low exposure conditions are used, by an on-pixel signal amplification with a significant charge gain. The electrical performance of a-IGZO TFT APS pixel circuit is investigated by SPICE simulation using modified Rensselaer Polytechnic Institute amorphous silicon (a-Si:H) TFT model. Finally, the noise, detective quantum efficiency (DQE), and resolvability of the complete system are modeled using the cascaded system formalism. Results: The result demonstrates that a large charge gain of 31–122 is achieved for the proposed high-mobility (5–20 cm{sup 2}/V s) amorphous metal-oxide TFT APS. The charge gain is sufficient to eliminate the TFT thermal noise, flicker noise as well as the external readout circuit noise. Moreover, the low TFT (<10{sup −13} A) and OPD (<10{sup −8} A/cm{sup 2}) leakage currents can further reduce the APS noise. Cascaded system analysis shows that the proposed APS imager with a 75 μm pixel pitch can effectively resolve the Nyquist frequency of 6.67 lp/mm, which can be further improved to ∼10 lp/mm if the pixel pitch is reduced to 50 μm. Moreover, the

  11. Characteristics of Disorder and Defect in Hydrogenated Amorphous Silicon Nitride Thin Films Containing Silicon Nanograins

    Institute of Scientific and Technical Information of China (English)

    DING Wen-ge; YU Wei; ZHANG Jiang-yong; HAN Li; FU Guang-sheng

    2006-01-01

    The hydrogenated amorphous silicon nitride (SiNx) thin films embedded with nano-structural silicon were prepared and the microstructures at the interface of silicon nano-grains/SiNx were identified by the optical absorption and Raman scattering measurements. Characterized by the exponential tail of optical absorption and the band-width of the Raman scattering TO mode, the disorder in the interface region increases with the gas flow ratio increasing. Besides, as reflected by the sub-gap absorption coefficients, the density of interface defect states decreases, which can be attributed to the structural mismatch in the interface region and also the changes of hydrogen content in the deposited films. Additional annealing treatment results in a significant increase of defects and degree of disorder, for which the hydrogen out-diffusion in the annealing process would be responsible.

  12. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Science.gov (United States)

    Abdulraheem, Yaser; Gordon, Ivan; Bearda, Twan; Meddeb, Hosny; Poortmans, Jozef

    2014-05-01

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties -including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  13. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Directory of Open Access Journals (Sweden)

    Yaser Abdulraheem

    2014-05-01

    Full Text Available An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si wafers by plasma enhanced chemical vapor deposition (PECVD. The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause

  14. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    International Nuclear Information System (INIS)

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  15. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Abdulraheem, Yaser, E-mail: yaser.abdulraheem@kuniv.edu.kw [Electrical Engineering Department, College of Engineering and Petroleum, Kuwait University. P.O. Box 5969, 13060 Safat (Kuwait); Gordon, Ivan; Bearda, Twan; Meddeb, Hosny; Poortmans, Jozef [IMEC, Kapeldreef 75, 3001, Leuven (Belgium)

    2014-05-15

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  16. Excellent crystalline silicon surface passivation by amorphous silicon irrespective of the technique used for chemical vapor deposition

    OpenAIRE

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; Sark, W.G.J.H.M. van; Rath, J.K.; R. E. I. Schropp

    2011-01-01

    Crystalline silicon surface passivation by amorphous silicon deposited by three different chemical vapor deposition (CVD) techniques at low (T ∼ 130 °C) temperatures is compared. For all three techniques, surface recombination velocities (SRVs) are reduced by two orders of magnitude after prolonged thermal annealing at 200 °C. This reduction correlates with a decreased dangling bond density at the amorphous-crystalline interface, indicating that dangling bond saturation is the predominant mec...

  17. Optimization of radiation hardness and charge collection of edgeless silicon pixel sensors for photon science

    CERN Document Server

    Zhang, Jiaguo; Pennicard, David; Sarajlic, Milija; Graafsma, Heinz

    2014-01-01

    Recent progress in active-edge technology of silicon sensors enables the development of large-area tiled silicon pixel detectors with small dead space between modules by utilizing edgeless sensors. Such technology has been proven in successful productions of ATLAS and Medipix-based silicon pixel sensors by a few foundries. However, the drawbacks of edgeless sensors are poor radiation hardness for ionizing radiation and non-uniform charge collection by edge pixels. In this work, the radiation hardness of edgeless sensors with different polarities has been investigated using Synopsys TCAD with X-ray radiation-damage parameters implemented. Results show that if no conventional guard ring is present, none of the current designs are able to achieve a high breakdown voltage (typically < 30 V) after irradiation to a dose of ~10 MGy. In addition, a charge-collection model has been developed and was used to calculate the charges collected by the edge pixels of edgeless sensors when illuminated with X-rays. The mode...

  18. Technological customization of uncooled amorphous silicon microbolometer for THz real time imaging

    Science.gov (United States)

    Pocas, S.; Deronzier, E.; Brianceau, P.; Imperinetti, P.; Dumont, G.; Roule, A.; Rabaud, W.; Meilhan, J.; Simoens, F.; Goudon, V.; Vialle, Claire; Arnaud, A.

    2013-03-01

    Terahertz uncooled antenna-coupled microbolometer focal plane arrays are being developed at CEA Leti for real time THz imaging and sensing. This detector relies on LETI amorphous silicon uncooled infrared bolometer technology that has been deeply modified to optimize sensitivity in the THz range. The main technological key lock of the pixel structure is the quarter wavelength cavity that consists in a thick dielectric layer deposited over the metalized CMOS wafer; such cavity improves significantly the optical coupling efficiency. Copper plugs connect the microbolometer level down to the CMOS readout circuit (ROIC) upper metal pads through this thick dielectric cavity. This paper explains how we have improved the copper vias technology and the challenges we have faced to customize the microbolometer while keeping a monolithically above IC technology fully compatible with standard silicon processes. The results show a very good operability and reproducibility of the contact through this thick oxide cavity. Due to these good results, we have been able to characterize a very efficient THz absorption that enables real time imaging with high sensitivity in the 1-3 THz range.

  19. Beam test characterization of CMS silicon pixel detectors for the phase-1 upgrade

    International Nuclear Information System (INIS)

    The Silicon Pixel Detector forms the innermost part of the CMS tracking system and is critical to track and vertex reconstruction. Being in close proximity to the beam interaction point, it is exposed to the highest radiation levels in the silicon tracker. In order to preserve the tracking performance with the LHC luminosity increase which is foreseen for the next years, the CMS collaboration has decided to build a new pixel detector with four barrel layers mounted around a reduced diameter beam pipe, as compared to the present three layer pixel detector in the central region. A new digital version of the front-end readout chip has been designed and tested; it has increased data buffering and readout link speed to maintain high efficiency at increasing occupancy. In addition, it offers lower charge thresholds that will improve the tracking efficiency and position resolution. Single chip modules have been evaluated in the DESY electron test beam in terms of charge collection, noise, tracking efficiency and position resolution before and after irradiation with 24 GeV protons from the CERN Proton Synchroton equivalent to the fluence expected after 500 fb−1 of integrated luminosity in the fourth layer of the pixel tracker. High efficiency and an excellent position resolution have been observed which are well maintained even after the proton irradiation. The results are well described by the CMS pixel detector simulation

  20. Novel silicon n-in-p pixel sensors for the future ATLAS upgrades

    International Nuclear Information System (INIS)

    In view of the LHC upgrade phases towards HL-LHC the ATLAS experiment plans to upgrade the inner detector with an all silicon system. The n-in-p silicon technology is a promising candidate for the pixel upgrade thanks to its radiation hardness and cost effectiveness that allow for enlarging the area instrumented with pixel detectors. We present the characterization and performance of novel n-in-p planar pixel sensors produced by CiS (Germany) connected by bump bonding to the ATLAS readout chip FE-I3. These results are obtained before and after irradiation up to a fluence of 10161-MeV neqcm−2, and prove the operability of this kind of sensors in the harsh radiation environment foreseen for the pixel system at HL-LHC. We also present an overview of the new pixel production, which is on-going at CiS for sensors compatible with the new ATLAS readout chip FE-I4

  1. Novel Silicon n-in-p Pixel Sensors for the future ATLAS Upgrades

    CERN Document Server

    La Rosa, A; Macchiolo, A; Nisius, R; Pernegger, H; Richter,R H; Weigell, P

    2013-01-01

    In view of the LHC upgrade phases towards HL-LHC the ATLAS experiment plans to upgrade the Inner Detector with an all silicon system. The n-in-p silicon technology is a promising candidate for the pixel upgrade thanks to its radiation hardness and cost eectiveness, that allow for enlarging the area instrumented with pixel detectors. We present the characterization and performance of novel n-in-p planar pixel sensors produced by CiS (Germany) connected by bump bonding to the ATLAS readout chip FE-I3. These results are obtained before and after irradiation up to a fluence of 1016 1-MeV $n_{eq}cm^{-2}$, and prove the operability of this kind of sensors in the harsh radiation environment foreseen for the pixel system at HL-LHC. We also present an overview of the new pixel production, which is on-going at CiS for sensors compatible with the new ATLAS readout chip FE-I4.

  2. Novel silicon n-in-p pixel sensors for the future ATLAS upgrades

    Science.gov (United States)

    La Rosa, A.; Gallrapp, C.; Macchiolo, A.; Nisius, R.; Pernegger, H.; Richter, R. H.; Weigell, P.

    2013-08-01

    In view of the LHC upgrade phases towards HL-LHC the ATLAS experiment plans to upgrade the inner detector with an all silicon system. The n-in-p silicon technology is a promising candidate for the pixel upgrade thanks to its radiation hardness and cost effectiveness that allow for enlarging the area instrumented with pixel detectors. We present the characterization and performance of novel n-in-p planar pixel sensors produced by CiS (Germany) connected by bump bonding to the ATLAS readout chip FE-I3. These results are obtained before and after irradiation up to a fluence of 10161-MeV neq cm-2, and prove the operability of this kind of sensors in the harsh radiation environment foreseen for the pixel system at HL-LHC. We also present an overview of the new pixel production, which is on-going at CiS for sensors compatible with the new ATLAS readout chip FE-I4.

  3. Electronic properties of intrinsic and doped amorphous silicon carbide films

    Energy Technology Data Exchange (ETDEWEB)

    Vetter, M. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)]. E-mail: mvetter@eel.upc.edu; Voz, C. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Ferre, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Martin, I. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Orpella, A. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Puigdollers, J. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Andreu, J. [Departament de Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, E-08028 Barcelona (Spain); Alcubilla, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)

    2006-07-26

    Hydrogenated amorphous silicon carbide (a-SiC{sub x} : H) films have shown excellent surface passivation of crystalline silicon. With the aim of large area deposition of these films the influence of the rf plasma power was investigated. It is found that homogenous deposition with effective surface recombination velocity lower than 100 cms{sup -1} is possible up to 6'' diameter in a simple parallel plate reactor by optimizing deposition parameters. For application in solar cell processes the conductivity of these a-SiC{sub x} : H films might become of importance since good surface passivation results from field-effect passivation which needs an insulating dielectric layer. Therefore, the temperature dependence of the dark dc conductivity of these films was investigated in the temperature range from - 20 to 260 deg. C. Two transition temperatures, T {sub s}{approx}80 deg. C and T {sub s}{approx}170 deg. C, were found where conductivity increases, resp. decreases over-exponential. From Arrhenius plots activation energy (E {sub a}) and conductivity pre-factor ({sigma} {sub 0}) were calculated for a large number of samples with different composition. A correlation between E {sub a} and {sigma} {sub 0} was found giving a Meyer-Neldel relation with a slope of 59 mV, corresponding to a material characteristic temperature T {sub m} = 400 deg. C, and an intercept at {sigma} {sub 00} = 0.1 {omega}{sup -1}cm{sup -1}.

  4. Electronic properties of intrinsic and doped amorphous silicon carbide films

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation of crystalline silicon. With the aim of large area deposition of these films the influence of the rf plasma power was investigated. It is found that homogenous deposition with effective surface recombination velocity lower than 100 cms-1 is possible up to 6'' diameter in a simple parallel plate reactor by optimizing deposition parameters. For application in solar cell processes the conductivity of these a-SiCx : H films might become of importance since good surface passivation results from field-effect passivation which needs an insulating dielectric layer. Therefore, the temperature dependence of the dark dc conductivity of these films was investigated in the temperature range from - 20 to 260 deg. C. Two transition temperatures, T s∼80 deg. C and T s∼170 deg. C, were found where conductivity increases, resp. decreases over-exponential. From Arrhenius plots activation energy (E a) and conductivity pre-factor (σ 0) were calculated for a large number of samples with different composition. A correlation between E a and σ 0 was found giving a Meyer-Neldel relation with a slope of 59 mV, corresponding to a material characteristic temperature T m = 400 deg. C, and an intercept at σ 00 = 0.1 Ω-1cm-1

  5. Pulsed Excimer (KrF) Laser Melting of Amorphous and Crystalline Silicon Layers

    OpenAIRE

    Walthuis, A.; Stritzker, B.; White, C. W.; J. Narayan; Aziz, Michael

    1985-01-01

    We have investigated depth of melting as a function of pulse energy density in amorphous and crystalline silicon layers. The melting threshold for KrF laser pulses (lambda=0.249 µm, tau=24×10−9 s) in amorphous (7660-Å-thick) and crystalline silicon layers were determined to be 0.16±0.02 and 0.75±0.05 J cm−2, respectively. The formation of fine- and large-polycrystalline regions was clearly identified in the amorphous silicon layers for energy densities below that needed for complete annealing...

  6. Temperature dependence of hydrogenated amorphous silicon solar cell performances

    Science.gov (United States)

    Riesen, Y.; Stuckelberger, M.; Haug, F.-J.; Ballif, C.; Wyrsch, N.

    2016-01-01

    Thin-film hydrogenated amorphous silicon solar (a-Si:H) cells are known to have better temperature coefficients than crystalline silicon cells. To investigate whether a-Si:H cells that are optimized for standard conditions (STC) also have the highest energy yield, we measured the temperature and irradiance dependence of the maximum power output (Pmpp), the fill factor (FF), the short-circuit current density (Jsc), and the open-circuit voltage (Voc) for four series of cells fabricated with different deposition conditions. The parameters varied during plasma-enhanced chemical vapor deposition (PE-CVD) were the power and frequency of the PE-CVD generator, the hydrogen-to-silane dilution during deposition of the intrinsic absorber layer (i-layer), and the thicknesses of the a-Si:H i-layer and p-type hydrogenated amorphous silicon carbide layer. The results show that the temperature coefficient of the Voc generally varies linearly with the Voc value. The Jsc increases linearly with temperature mainly due to temperature-induced bandgap reduction and reduced recombination. The FF temperature dependence is not linear and reaches a maximum at temperatures between 15 °C and 80 °C. Numerical simulations show that this behavior is due to a more positive space-charge induced by the photogenerated holes in the p-layer and to a recombination decrease with temperature. Due to the FF(T) behavior, the Pmpp (T) curves also have a maximum, but at a lower temperature. Moreover, for most series, the cells with the highest power output at STC also have the best energy yield. However, the Pmpp (T) curves of two cells with different i-layer thicknesses cross each other in the operating cell temperature range, indicating that the cell with the highest power output could, for instance, have a lower energy yield than the other cell. A simple energy-yield simulation for the light-soaked and annealed states shows that for Neuchâtel (Switzerland) the best cell at STC also has the best energy

  7. Nano structures of amorphous silicon: localization and energy gap

    Directory of Open Access Journals (Sweden)

    Z Nourbakhsh

    2013-10-01

    Full Text Available Renewable energy research has created a push for new materials; one of the most attractive material in this field is quantum confined hybrid silicon nano-structures (nc-Si:H embedded in hydrogenated amorphous silicon (a-Si:H. The essential step for this investigation is studying a-Si and its ability to produce quantum confinement (QC in nc-Si: H. Increasing the gap of a-Si system causes solar cell efficiency to increase. By computational calculations based on Density Functional Theory (DFT, we calculated a special localization factor, [G Allan et al., Phys. Rev. B 57 (1997 6933.], for the states close to HOMO and LUMO in a-Si, and found most weak-bond Si atoms. By removing these silicon atoms and passivating the system with hydrogen, we were able to increase the gap in the a-Si system. As more than 8% hydrogenate was not experimentally available, we removed about 2% of the most localized Si atoms in the almost tetrahedral a-Si system. After removing localized Si atoms in the system with 1000 Si atoms, and adding 8% H, the gap increased about 0.24 eV. Variation of the gap as a function of hydrogen percentage was in good agreement with the Tight –Binding results, but about 2 times more than its experimental value. This might come from the fact that in the experimental conditions, it does not have the chance to remove the most localized states. However, by improving the experimental conditions and technology, this value can be improved.

  8. Optimization of radiation hardness and charge collection of edgeless silicon pixel sensors for photon science

    International Nuclear Information System (INIS)

    Recent progress in active-edge technology of silicon sensors enables the development of large-area tiled silicon pixel detectors with small dead space between modules by utilizing edgeless sensors. Such technology has been proven in successful productions of ATLAS and Medipix-based silicon pixel sensors by a few foundries. However, the drawbacks of edgeless sensors are poor radiation hardness for ionizing radiation and non-uniform charge collection by edge pixels. In this work, the radiation hardness of edgeless sensors with different polarities has been investigated using Synopsys TCAD with X-ray radiation-damage parameters implemented. Results show that if no conventional guard ring is present, none of the current designs are able to achieve a high breakdown voltage (typically < 30 V) after irradiation to a dose of ∼ 10 MGy. In addition, a charge-collection model has been developed and was used to calculate the charges collected by the edge pixels of edgeless sensors when illuminated with X-rays. The model takes into account the electric field distribution inside the pixel sensor, the absorption of X-rays, drift and diffusion of electrons and holes, charge sharing effects, and threshold settings in ASICs. It is found that the non-uniform charge collection of edge pixels is caused by the strong bending of the electric field and the non-uniformity depends on bias voltage, sensor thickness and distance from active edge to the last pixel (''edge space). In particular, the last few pixels close to the active edge of the sensor are not sensitive to low-energy X-rays ( < 10 keV), especially for sensors with thicker Si and smaller edge space. The results from the model calculation have been compared to measurements and good agreement was obtained. The model can be used to optimize the edge design. From the edge optimization, it is found that in order to guarantee the sensitivity of the last few pixels to low-energy X-rays, the edge space should be kept at

  9. Characterization of 13 and 30 mum thick hydrogenated amorphous silicon diodes deposited over CMOS integrated circuits for particle detection application

    CERN Document Server

    Despeisse, M; Commichau, S C; Dissertori, G; Garrigos, A; Jarron, P; Miazza, C; Moraes, D; Shah, A; Wyrsch, N; Viertel, Gert M

    2004-01-01

    We present the experimental results obtained with a novel monolithic silicon pixel detector which consists in depositing a n-i-p hydrogenated amorphous silicon (a-Si:H) diode straight above the readout ASIC (this technology is called Thin Film on ASIC, TFA). The characterization has been performed on 13 and 30mum thick a-Si:H films deposited on top of an ASIC containing a linear array of high- speed low-noise transimpedance amplifiers designed in a 0.25mum CMOS technology. Experimental results presented have been obtained with a 600nm pulsed laser. The results of charge collection efficiency and charge collection speed of these structures are discussed.

  10. Analysis of IV characteristics of solar cells made of hydrogenated amorphous, polymorphous and microcrystalline silicon

    International Nuclear Information System (INIS)

    The IV characteristics of pin solar cells made of amorphous, polymorphous and microcrystalline silicon were investigated. The temperature dependence was measured in the temperature range between 150 K and 395 K. This range covers the most terrestrial applications condition. Using simplex procedure, the IV parameter of the cells were deduce using line fitting. It has been shown that polymorphous silicon shows electrical properties that are close to properties of microcrystalline silicon but as it is well known, polymorphous silicon shows higher absorption similar to amorphous silicon. The polymorphous silicon solar cells showed higher efficiencies, lower shunting and higher filling factors. In the above mentioned temperature range, polymorphous silicon is the better material for the manufacturing of thin film hydrogenated silicon pin solar cells. More investigations concerning the structural properties are necessary to make stronger conclusions in regards to the stability of the material, what we hope to do in the future. (author)

  11. Growth of crystalline silicon nanowires on nickel-coated silicon wafer beneath sputtered amorphous carbon

    International Nuclear Information System (INIS)

    Growth of crystalline silicon nanowire of controllable diameter directly from Si wafer opens up another avenue for its application in solar cells and optical sensing. Crystalline Si nanowire can be directly grown from Si wafer upon rapid thermal annealing in the presence of the catalyst such as nickel (Ni). However, the accompanying oxidation immediately changes the crystalline Si nanowire to amorphous SiOx. In this study, amorphous carbon layer was sputtered to on top of the catalyst Ni layer to retard the oxidation. Scanning electron microscope, transmission electron microscope, Raman spectroscopy and X-ray photoelectron spectroscopy were employed to characterize the wires and oxidation process. A model was developed to explain the growth and oxidation process of the crystalline Si nanowire. - Highlights: ► Carbon was sputtered on nickel to retard the oxidation of silicon nanowires. ► Silicon core was controlled by carbon layer thickness and annealing duration. ► An oxidation-accompanying solid–liquid–solid growth mechanism was developed

  12. Beam Test Performance and Simulation of Prototypes for the ALICE Silicon Pixel Detector

    CERN Document Server

    Conrad, J; Antinori, F; Badalà, A; Barbera, R; Boccardi, A; Bruno, G E; Burns, M; Cali, I A; Campbell, M; Caselle, M; Ceresa, S; Chochula, P; Cinausero, M; Dima, R; Elia, D; Fabris, D; Fini, R A; Fioretto, E; Kapusta, S; Kluge, A; Krivda, M; Lenti, V; Librizzi, F; Lunardon, M; Manzari, V; Morel, M; Moretto, S; Morsch, A; Nilsson, P; Noriega, M L; Osmic, F; Pappalardo, G S; Paticchio, V; Pepato, Adriano; Prete, G; Pulvirenti, A; Riedler, P; Riggi, F; Santoro, R; Scarlassara, F; Segato, G F; Soramel, F; Stefanini, G; Sándor, L; Torcatode-Matos, C; Turrisi, R; Vannucci, L; Viesti, G; Virgili, T

    2007-01-01

    The silicon pixel detector (SPD) of the ALICE experiment in preparation at the Large Hadron Collider (LHC) at CERN is designed to provide the precise vertex reconstruction needed for measuring heavy flavor production in heavy ion collisions at very high energies and high multiplicity. The SPD forms the innermost part of the Inner Tracking System (ITS) which also includes silicon drift and silicon strip detectors. Single assembly prototypes of the ALICE SPD have been tested at the CERN SPS using high energy proton/pion beams in 2002 and 2003. We report on the experimental determination of the spatial precision. We also report on the first combined beam test with prototypes of the other ITS silicon detector technologies at the CERN SPS in November 2004. The issue of SPD simulation is briefly discussed.

  13. Controlled growth of nanocrystalline silicon within amorphous silicon carbide thin films

    Science.gov (United States)

    Kole, Arindam; Chaudhuri, Partha

    2014-04-01

    Controlled formation of nanocrystalline silicon (nc-Si) within hydrogenated amorphous silicon carbide (a-SiC:H) thin films has been demonstrated by a rf (13.56 MHz) plasma chemical vapour deposition (PECVD) method at a low deposition temperature of 200°C by regulating the deposition pressure (Pr) between 26.7 Pa and 133.3 Pa. Evolution of the size and the crystalline silicon volume fraction within the a-SiC:H matrix has been studied by XRD, Raman and HRTEM. The study reveals that at Pr of 26.7 Pa there are mostly isolated grains of nc-Si within the a-SiC:H matrix with average size of 4.5 nm. With increase of Pr the isolated nc-Si grains coalesce more and more giving rise to larger size connected nc-Si islands which appear as microcrystalline silicon in the Raman spectra. As a result net isolated nc-Si volume fraction decreases while the total crystalline silicon volume fraction increases.

  14. TFA pixel sensor technology for vertex detectors

    OpenAIRE

    Jarron, P.; Moraes, D.; Despeisse, M.; Dissertori, G.; Dunand, S.; Kaplon. J.; Miazza, C.; Shah, Arvind; Viertel, G M.; Wyrsch, Nicolas

    2008-01-01

    Pixel microvertex detectors at the SLHC and a future linear collider face very challenging issues: extreme radiation hardness, cooling design, interconnections density and fabrication cost. As an alternative approach we present a novel pixel detector based on the deposition of a Hydrogenated Amorphous Silicon (a-Si:H) film on top of a readout ASIC. The Thin-Film on ASIC (TFA) technology is inspired by an emerging microelectronic technology envisaged for visible light Active Pixel Sensor (APS)...

  15. Fabrication of solution-processed hydrogenated amorphous silicon single junction solar cells

    OpenAIRE

    Masuda, Takashi; Sotani, Naoya; Hamada, Hiroki; Matsuki, Yasuo; Shimoda, Tatsuya

    2012-01-01

    Hydrogenated amorphous silicon solar cells were fabricated using solution-based processes. All silicon layers of the p-i-n junction were stacked by a spin-cast method using doped and non-doped polydihydrosilane solutions. Further, a hydrogen-radical treatment under vacuum conditions was employed to reduce spin density in the silicon films. Following this treatment, the electric properties of the silicon films were improved, and the power conversion efficiency of the solar cells was also incre...

  16. Excellent crystalline silicon surface passivation by amorphous silicon irrespective of the technique used for chemical vapor deposition

    NARCIS (Netherlands)

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; van Sark, W.G.J.H.M.; Rath, J.K.; Schropp, R.E.I.

    2011-01-01

    Crystalline silicon surface passivation by amorphous silicon deposited by three different chemical vapor deposition (CVD) techniques at low (T ∼ 130 °C) temperatures is compared. For all three techniques, surface recombination velocities (SRVs) are reduced by two orders of magnitude after prolonged

  17. Temperature-dependent minority carrier lifetime of crystalline silicon wafers passivated by high quality amorphous silicon oxide

    Science.gov (United States)

    Inaba, Masahiro; Todoroki, Soichiro; Nakada, Kazuyoshi; Miyajima, Shinsuke

    2016-04-01

    We investigated the effects of annealing on the temperature-dependent minority carrier lifetime of a crystalline silicon wafer passivated by hydrogenated amorphous silicon oxide. The annealing significantly affects the lifetime and its temperature dependence. Our device simulations clearly indicate that valence band offset significantly affects the temperature dependence. We also found a slight increase in the interface defect density after annealing.

  18. An overview of uncooled infrared sensors technology based on amorphous silicon and silicon germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Ambrosio, Roberto; Mireles, Jose Jr. [Technology and Engineering Institute, Ciudad Juarez University UACJ, Av. Del Charro 450N, 32310 Chihuahua (Mexico); Moreno, Mario; Torres, Alfonso; Kosarev, Andrey [National Institute for Astrophysics Optics and Electronics INAOE, Luis E. Erro 1, PO Box 51 and 216, 7200 Puebla (Mexico); Heredia, Aurelio [Universidad Popular Autonoma del Estado de Puebla, 21 sur 1103 Col. Santiago, 72160 Puebla (Mexico)

    2010-04-15

    At the present time there are commercially available large un-cooled micro-bolometer arrays (as large as 1024 x 768 pixels) for a variety of thermal imaging applications. Different thermo-sensing materials have been employed as thermo sensing elements as Vanadium Oxide (VO{sub x}), metals, and amorphous and polycrystalline semiconductors. Those materials present good characteristics but also have some disadvantages. As a consequence none of the commercially available arrays contain optimum pixels with an optimum thermo-sensing material. This paper reviews the development of the un-cooled bolometer technology and the research achievements on this area, with special attention on the key factors that would lead to improve the pixels performance characteristics. The work considers the R and D of microbolometer arrays and the integration with MEMS and IC technologies. A comparative study with the state of the art and data reported in literature is presented. Finally, further directions of uncooled bolometer based in thin films materials are also discussed in this paper. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  19. Nonlinear Optical Functions in Crystalline and Amorphous Silicon-on-Insulator Nanowires

    DEFF Research Database (Denmark)

    Baets, R.; Kuyken, B.; Liu, X.;

    2012-01-01

    Silicon-on-Insulator nanowires provide an excellent platform for nonlinear optical functions in spite of the two-photon absorption at telecom wavelengths. Work on both crystalline and amorphous silicon nanowires is reviewed, in the wavelength range of 1.5 to 2.5 µm.......Silicon-on-Insulator nanowires provide an excellent platform for nonlinear optical functions in spite of the two-photon absorption at telecom wavelengths. Work on both crystalline and amorphous silicon nanowires is reviewed, in the wavelength range of 1.5 to 2.5 µm....

  20. Filter-free image sensor pixels comprising silicon nanowires with selective color absorption.

    Science.gov (United States)

    Park, Hyunsung; Dan, Yaping; Seo, Kwanyong; Yu, Young J; Duane, Peter K; Wober, Munib; Crozier, Kenneth B

    2014-01-01

    The organic dye filters of conventional color image sensors achieve the red/green/blue response needed for color imaging, but have disadvantages related to durability, low absorption coefficient, and fabrication complexity. Here, we report a new paradigm for color imaging based on all-silicon nanowire devices and no filters. We fabricate pixels consisting of vertical silicon nanowires with integrated photodetectors, demonstrate that their spectral sensitivities are governed by nanowire radius, and perform color imaging. Our approach is conceptually different from filter-based methods, as absorbed light is converted to photocurrent, ultimately presenting the opportunity for very high photon efficiency. PMID:24588103

  1. Silicon pixel detectors of a double-sided guard ring structure for radiation hardness

    Energy Technology Data Exchange (ETDEWEB)

    Cho, Hyo Sung [Yonsei Univ., Wonju (Korea, Republic of); Chien, Chih Yung [Johns Hopkins Univ., Baltimore (United States)

    2003-08-01

    The lifetime of silicon detectors in a severe radiation environment at CERN LHC depends strongly upon careful detector design and material selection due to the anticipated radiation -induced damage. We recently fabricated more radiation-tolerant silicon pixel detectors of a double-sided guard ring structure. The electrical characterization of such detectors was performed before and after irradiation to neutron fluence (1Mev equivalent ) up to 6 x 10{sup 14} n/cm{sup 2} by measuring the leakage current, the full depletion voltage, and the potential distribution over the guard rings.

  2. Design, production and first operation of the ALICE Silicon Pixel Detector system

    CERN Document Server

    Kluge, A; Antinori, F; Burns, M; Cali, I A; Campbell, M; Caselle, M; Cavicchioli, C; Dima, R; Elia, D; Fabris, D; Krivda, M; Librizzi, F; Manzari, V; Marangio, G; Morel, M; Moretto, S; Osmic, F; Pappalardo, G S; Pepato, Adriano; Pulvirenti, A; Riedler, P; Riggi, F; Santoro, R; Stefanini, G; Torcato Matos, C; Turrisi, R; Tydesjol, H; Viesti, G

    2008-01-01

    The ALICE Silicon Pixel Detector (SPD) constitutes the two innermost barrel layers of the ALICE experiment. The SPD is the detector closest to the interaction point, mounted around the beam pipe with the two layers at r=3.9 cm and 7.6 cm distance from beam axis. In order to reduce multiple scattering the material budget per layer in the active region has been limited to ≈1% X0. The SPD consists of 120 hybrid silicon pixel detectors modules with a total of ~107 cells. The on-detector read-out is based on a multi-chip-module containing 4 ASICs and an optical transceiver module. The readout electronics, located in the control room, is housed in 20 VME boards; it is the interface to the ALICE trigger, data acquisition, control system and detector electronics. In this contribution the SPD detector components design and production are reviewed. First operation results are reported.

  3. A Medipix2-based imaging system for digital mammography with silicon pixel detectors

    CERN Document Server

    Bisogni, M G; Fantacci, M E; Mettivier, G; Montesi, M C; Novelli, M; Quattrocchi, M; Rosso, V; Russo, P; Stefanini, A

    2004-01-01

    In this paper we present the first tests of a digital imaging system based on a silicon pixel detector bump-bonded to an integrated circuit operating in single photon counting mode. The X-rays sensor is a 300 mu m thick silicon, 14 by 14 mm/sup 2/, upon which a matrix of 256 * 256 pixels has been built. The read-out chip, named MEDIPIX2, has been developed at CERN within the MEDIPIX2 Collaboration and it is composed by a matrix of 256 * 256 cells, 55 * 55 mu m/sup 2/. The spatial resolution properties of the system have been assessed by measuring the square wave resolution function (SWRF) and first images of a standard mammographic phantom were acquired using a radiographic tube in the clinical irradiation condition. (5 refs).

  4. RF sputtering for controlling dihydride and monohydride bond densities in amorphous silicon hydride

    Science.gov (United States)

    Jeffery, F.R.; Shanks, H.R.

    1980-08-26

    A process is described for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicone produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous solicone hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  5. Anomalous interaction of longitudinal electric field with hydrogenated amorphous silicon films

    OpenAIRE

    Zhang, J.; Gecevičius, M.; Beresna, M; Kazanskii, A.G.; Kazansky, P. G.

    2013-01-01

    Cylindrically polarized beams produced by femtosecond laser written S-waveplate are used to modify amorphous silicon films. Paradoxically, no crystallization is observed in the maximum of longitudinal electric field despite the strongest light intensity

  6. Accuracy and long-term stability of amorphous-silicon measurements

    Science.gov (United States)

    Mueller, R.

    1986-01-01

    The measurement system requirements to obtain accurate electrical performance measurements of amorphous silicon cells and modules were described. The progress achieved in modifying the Jet Propulsion Laboratory (JPL) system toward that objective were reviewed.

  7. Structural and electrical properties of metastable defects in hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Melskens, J.; Schnegg, A.; Baldansuren, A.; Lips, K.; Plokker, M.P.; Eijt, S.W.H.; Schut, H.; Fischer, M.; Zeman, M.; Smets, A.H.M.

    2015-01-01

    The structural and electrical properties of metastable defects in various types of hydrogenated amorphous silicon have been studied using a powerful combination of continuous wave electron-paramagnetic resonance spectroscopy, electron spin echo (ESE) decay measurements, and Doppler broadening positr

  8. Solution growth of microcrystalline silicon on amorphous substrates

    Energy Technology Data Exchange (ETDEWEB)

    Heimburger, Robert

    2010-07-05

    This work deals with low-temperature solution growth of micro-crystalline silicon on glass. The task is motivated by the application in low-cost solar cells. As glass is an amorphous material, conventional epitaxy is not applicable. Therefore, growth is conducted in a two-step process. The first step aims at the spatial arrangement of silicon seed crystals on conductive coated glass substrates, which is realized by means of vapor-liquid-solid processing using indium as the solvent. Seed crystals are afterwards enlarged by applying a specially developed steady-state solution growth apparatus. This laboratory prototype mainly consists of a vertical stack of a silicon feeding source and the solvent (indium). The growth substrate can be dipped into the solution from the top. The system can be heated to a temperature below the softening point of the utilized glass substrate. A temperature gradient between feeding source and growth substrate promotes both, supersaturation and material transport by solvent convection. This setup offers advantages over conventional liquid phase epitaxy at low temperatures in terms of achievable layer thickness and required growth times. The need for convective solute transport to gain the desired thickness of at least 50 {mu}m is emphasized by equilibrium calculations in the binary system indium-silicon. Material transport and supersaturation conditions inside the utilized solution growth crucible are analyzed. It results that the solute can be transported from the lower feeding source to the growth substrate by applying an appropriate heating regime. These findings are interpreted by means of a hydrodynamic analysis of fluid flow and supporting FEM simulation. To ensure thermodynamic stability of all materials involved during steady-state solution growth, the ternary phase equilibrium between molybdenum, indium and silicon at 600 C was considered. Based on the obtained results, the use of molybdenum disilicide as conductive coating

  9. Test Beam Results of 3D Silicon Pixel Sensors for the ATLAS upgrade

    CERN Document Server

    Grenier, P; Barbero, M; Bates, R; Bolle, E; Borri, M; Boscardin, M; Buttar, C; Capua, M; Cavalli-Sforza, M; Cobal, M; Cristofoli, A; Dalla Betta, G F; Darbo, G; Da Via, C; Devetak, E; DeWilde, B; Di Girolamo, B; Dobos, D; Einsweiler, K; Esseni, D; Fazio, S; Fleta, C; Freestone, J; Gallrapp, C; Garcia-Sciveres, M; Gariano, G; Gemme, C; Giordani, M P; Gjersdal, H; Grinstein, S; Hansen, T; Hansen, T E; Hansson, P; Hasi, J; Helle, K; Hoeferkamp, M; Hugging, F; Jackson, P; Jakobs, K; Kalliopuska, J; Karagounis, M; Kenney, C; Köhler, M; Kocian, M; Kok, A; Kolya, S; Korokolov, I; Kostyukhin, V; Krüger, H; La Rosa, A; Lai, C H; Lietaer, N; Lozano, M; Mastroberardino, A; Micelli, A; Nellist, C; Oja, A; Oshea, V; Padilla, C; Palestri, P; Parker, S; Parzefall, U; Pater, J; Pellegrini, G; Pernegger, H; Piemonte, C; Pospisil, S; Povoli, M; Roe, S; Rohne, O; Ronchin, S; Rovani, A; Ruscino, E; Sandaker, H; Seidel, S; Selmi, L; Silverstein, D; Sjøbaek, K; Slavicek, T; Stapnes, S; Stugu, B; Stupak, J; Su, D; Susinno, G; Thompson, R; Tsung, J W; Tsybychev, D; Watts, S J; Wermes, N; Young, C; Zorzi, N

    2011-01-01

    Results on beam tests of 3D silicon pixel sensors aimed at the ATLAS Insertable-B-Layer and High Luminosity LHC (HL-LHC)) upgrades are presented. Measurements include charge collection, tracking efficiency and charge sharing between pixel cells, as a function of track incident angle, and were performed with and without a 1.6 T magnetic field oriented as the ATLAS Inner Detector solenoid field. Sensors were bump bonded to the front-end chip currently used in the ATLAS pixel detector. Full 3D sensors, with electrodes penetrating through the entire wafer thickness and active edge, and double-sided 3D sensors with partially overlapping bias and read-out electrodes were tested and showed comparable performance.

  10. Test Results on the Silicon Pixel Detector for the TTF-FEL Beam Trajectory Monitor

    CERN Document Server

    Hillert, S; Müller, U C; Roth, S; Hansen, K; Holl, P; Karstensen, S; Kemmer, J; Klanner, Robert; Lechner, P; Leenen, M; Ng, J S T; Schmüser, P; Strüder, L

    2001-01-01

    Test measurements on the silicon pixel detector for the beam trajectory monitor at the free electron laser of the TESLA test facility are presented. To determine the electronic noise of detector and read-out and to calibrate the signal amplitude of different pixels the 6 keV photons of the manganese K line are used. Two different methods determine the spatial accuracy of the detector: In one setup a laser beam is focused to a straight line and moved across the pixel structure. In the other the detector is scanned using a low-intensity electron beam of an electron microscope. Both methods show that the symmetry axis of the detector defines a straight line within 0.4 microns. The sensitivity of the detector to low energy X-rays is measured using a vacuum ultraviolet beam at the synchrotron light source HASYLAB. Additionally, the electron microscope is used to study the radiation hardness of the detector.

  11. Test beam results of 3D silicon pixel sensors for the ATLAS upgrade

    International Nuclear Information System (INIS)

    Results on beam tests of 3D silicon pixel sensors aimed at the ATLAS Insertable B-Layer and High Luminosity LHC (HL-LHC) upgrades are presented. Measurements include charge collection, tracking efficiency and charge sharing between pixel cells, as a function of track incident angle, and were performed with and without a 1.6 T magnetic field oriented as the ATLAS inner detector solenoid field. Sensors were bump-bonded to the front-end chip currently used in the ATLAS pixel detector. Full 3D sensors, with electrodes penetrating through the entire wafer thickness and active edge, and double-sided 3D sensors with partially overlapping bias and read-out electrodes were tested and showed comparable performance.

  12. A CMOS analog front-end for silicon pixel detectors for γ imaging in medical application

    International Nuclear Information System (INIS)

    In recent works we presented the γ0, a chip expressely designed for γ imaging in medical application. The chip was designed to be the anode of an Integrated Silicon Pixel Array (ISPA) tube. This chip consists of a matrix of 1024 pixels each 135u by 135u, each pixel comprises a CSA, designed to handle signals of few thousand electrons, a shaper, a discriminator and a 10 bit event buffer. The chip addresses many issues that are essential for the realization of cheap and fast detectors. Particularly it integrates a DAC controlled biasing network and an energy discrimination system. In this work, we present the test system and the first test results for the γ0

  13. Neutron scattering studies of hydrogenated, deuterated and fluorinated amorphous silicon

    International Nuclear Information System (INIS)

    A comprehensive neutron scattering study has been performed of hydrogenated (Si0.78H0.22), deuterated (Si0.77D0.23) and partially fluorinated deuterated (Si0.725D0.120F0.155) amorphous silicon, prepared by the glow-discharge technique. The measurements performed include diffraction, small-angle neutron scattering (SANS) and inelastic neutron scattering, and the data obtained are discussed in terms of various structural models in the literature. The real-space correlation function for Si0.77D0.23 exhibits sharp peaks at 1.49 and 2.36 A, due to Si-D and Si-Si covalent bonds, respectively, while peaks centred at 3.2 and 3.8 A are due to Si-D and Si-Si second-neighbour distances. High-energy resolution inelastic scattering measurements for Si0.78H0.22 show that there are approximately equal numbers of ≡SiH and = SiH2 groupings, there being no indication of excitations corresponding to -SiH3 groupings. The presence of molecular hydrogen is demonstrated unambiguously by the observation of the ortho-to-para conversion, via molecular rotation modes at 14.5 and 29.4 meV. The shift in the Si-H stretch modes introduced by deuteration is slightly less than the value of √2 expected for free hydrogen, indicating a small but observable influence of the amorphous silicon matrix. The size of the cages containing the H2 molecules has been investigated via SANS, which yields a mean Guinier radius of ∼5-6 A. In addition, the use of the H-D SANS contrast technique indicates that each cage contains on average about 60 H2 (D2) molecules. The data for the Si0.725D0.120F0.155 sample are consistent with a previously suggested model of network cages predominantly containing molecular SiF4

  14. New concept of a submillimetric pixellated Silicon detector for intracerebral application

    International Nuclear Information System (INIS)

    A new beta+ radiosensitive microprobe implantable in rodent brain dedicated to in vivo and autonomous measurements of local time activity curves of beta radiotracers in a volume of brain tissue of a few mm3 has been developed recently. This project expands the concept of the previously designed beta microprobe, which has been validated extensively in neurobiological experiments performed on anesthetized animals. Due to its limitations considering recordings on awake and freely moving animals, we have proposed to develop a wireless setup that can be worn by an animal without constraining its movements. To that aim, we have chosen a highly beta sensitive Silicon-based detector to devise a compact pixellated probe. Miniaturized wireless electronics is used to read-out and transfer the measurement data. Initial Monte-Carlo simulations showed that high resistive Silicon pixels are appropriate for this purpose, with their dimensions to be adapted to our specific signals. More precisely, we demonstrated that 200 μm thick pixels with an area of 200 μm×500 μm are optimized in terms of beta+sensitivity versus relative transparency to the gamma background. Based on this theoretical study, we now present the development of the novel sensor, including the system simulations with technology computer-assisted design (TCAD) to investigate specific configurations of guard rings and their potential to increase the electrical isolation and stabilization of the pixel, as well as the corresponding physical tests to validate the particular geometries of this new sensor.

  15. New concept of a submillimetric pixellated Silicon detector for intracerebral application

    Science.gov (United States)

    Benoit, M.; Märk, J.; Weiss, P.; Benoit, D.; Clemens, J. C.; Fougeron, D.; Janvier, B.; Jevaud, M.; Karkar, S.; Menouni, M.; Pain, F.; Pinot, L.; Morel, C.; Laniece, P.

    2011-12-01

    A new beta+ radiosensitive microprobe implantable in rodent brain dedicated to in vivo and autonomous measurements of local time activity curves of beta radiotracers in a volume of brain tissue of a few mm3 has been developed recently. This project expands the concept of the previously designed beta microprobe, which has been validated extensively in neurobiological experiments performed on anesthetized animals. Due to its limitations considering recordings on awake and freely moving animals, we have proposed to develop a wireless setup that can be worn by an animal without constraining its movements. To that aim, we have chosen a highly beta sensitive Silicon-based detector to devise a compact pixellated probe. Miniaturized wireless electronics is used to read-out and transfer the measurement data. Initial Monte-Carlo simulations showed that high resistive Silicon pixels are appropriate for this purpose, with their dimensions to be adapted to our specific signals. More precisely, we demonstrated that 200 μm thick pixels with an area of 200 μm×500 μm are optimized in terms of beta+sensitivity versus relative transparency to the gamma background. Based on this theoretical study, we now present the development of the novel sensor, including the system simulations with technology computer-assisted design (TCAD) to investigate specific configurations of guard rings and their potential to increase the electrical isolation and stabilization of the pixel, as well as the corresponding physical tests to validate the particular geometries of this new sensor.

  16. Label-Free Direct Electronic Detection of Biomolecules with Amorphous Silicon Nanostructures

    OpenAIRE

    Lund, John; Mehta, Ranjana; Parviz, Babak A.

    2006-01-01

    We present the fabrication and characterization of a nano-scale sensor made of amorphous silicon for the label-free, electronic detection of three classes of biologically important molecules: ions, oligonucleotides, and proteins. The sensor structure has an active element which is a 50 nm wide amorphous silicon semicircle and has a total footprint of less than 4 μm2. We demonstrate the functionalization of the sensor with receptor molecules and the electronic detection of three targets: H+ io...

  17. Modeling the Crystallization of Amorphous Silicon Thin Films Using a High Repetition Rate Scanning Laser

    OpenAIRE

    Černý, R.; A. Kalbáč

    2000-01-01

    An optimum design of experimental setup for the preparation of polycrystalline silicon (pc-Si) films from amorphous layers applicable in the solar cell production is analyzed in the paper. In the computational simulations, the influence of basic characteristic parameters of the experimental procedure on the mechanisms of pc-Si lateral growth is studied. Among these parameters, the energy density of the applied laser and the thickness of the amorphous silicon (a-Si) layer are identified ...

  18. Optical determination of the mass density of amorphous and microcrystalline silicon layers with different hydrogen contents

    OpenAIRE

    Remeš, Z.; Vaněček, Milan; Torres, Pedro; Kroll, U.; Mahan, A. H.; Crandall, R. S.

    2008-01-01

    We have measured the density of amorphous and microcrystalline silicon films using an optical method. The mass density decreases with increasing hydrogen content, consistent with a hydrogenated di-vacancy model that fits the data for amorphous silicon. Material produced by hot wire assisted chemical vapour deposition, with low hydrogen content, has a higher density and is structurally different from glow discharge material with hydrogen content around 10 at.%. The lower density microcrystalli...

  19. Electronic Structure of Dangling Bonds in Amorphous Silicon Studied via a Density-Matrix Functional Method

    OpenAIRE

    Hennig, R. G.; Fedders, P. A.; Carlsson, A. E.

    2002-01-01

    A structural model of hydrogenated amorphous silicon containing an isolated dangling bond is used to investigate the effects of electron interactions on the electronic level splittings, localization of charge and spin, and fluctuations in charge and spin. These properties are calculated with a recently developed density-matrix correlation-energy functional applied to a generalized Anderson Hamiltonian, consisting of tight-binding one-electron terms parametrizing hydrogenated amorphous silicon...

  20. Experimental and Computer Modelling Studies of Metastability of Amorphous Silicon Based Solar Cells

    OpenAIRE

    Munyeme, Geoffrey

    2003-01-01

    We present a combination of experimental and computer modelling studies of the light induced degradation in the performance of amorphous silicon based single junction solar cells. Of particular interest in this study is the degradation kinetics of different types of amorphous silicon single junction solar cells and the role of dangling bond states in mediating or driving the degradation mechanism. The approach taken in this study has enabled has to examine how light induced degradation is aff...

  1. In situ ultraviolet treatment in an Ar ambient upon p-type hydrogenated amorphous silicon-carbide windows of hydrogenated amorphous silicon based solar cells

    International Nuclear Information System (INIS)

    We proposed an in situ postdeposition ultraviolet treatment in an Ar ambient (UTA) to improve the p/i interface of amorphous silicon based solar cell. We have increased the conversion efficiency by ∼16% by improving the built-in potential and reducing recombination at the p/i interface. Through spectroscopic ellipsometry and Fourier-transform infrared measurements, it is concluded that the UTA process induces structural modification of the p-type hydrogenated amorphous silicon-carbide (p-a-SiC:H) window layer. An ultrathin p-a-SiC:H contamination layer formed during the UTA process acts as a buffer layer at the interface

  2. Evaluation of Bonding Orbitals in Amorphous Silicon by Means of the Chemical Pseudopotential Method

    OpenAIRE

    Grado Caffaro, M. A.; Grado Caffaro, M.

    1994-01-01

    The chemical pseudopotential method has been used by a number of workers in order to study the valence bands of amorphous tetrahedrally bonded semiconductors. However, various problems related to this method are unsolved. In this paper, a theoretical formulation tending to clarify some of these. problems is presented. This formulation concerns bonding orbitals and is valid, in principle, for amorphous silicon.

  3. Size modulation of nanocrystalline silicon embedded in amorphous silicon oxide by Cat-CVD

    International Nuclear Information System (INIS)

    Different issues related to controlling size of nanocrystalline silicon (nc-Si) embedded in hydrogenated amorphous silicon oxide (a-SiOx:H) deposited by catalytic chemical vapor deposition (Cat-CVD) have been reported. Films were deposited using tantalum (Ta) and tungsten (W) filaments and it is observed that films deposited using tantalum filament resulted in good control on the properties. The parameters which can affect the size of nc-Si domains have been studied which include hydrogen flow rate, catalyst and substrate temperatures. The deposited samples are characterized by X-ray diffraction, HRTEM and micro-Raman spectroscopy, for determining the size of the deposited nc-Si. The crystallite formation starts for Ta-catalyst around the temperature of 1700 oC.

  4. Quantitative assessment of molecular dynamics-grown amorphous silicon and germanium films on silicon (111)

    Science.gov (United States)

    Käshammer, Peter; Borgardt, Nikolai I.; Seibt, Michael; Sinno, Talid

    2016-09-01

    Molecular dynamics based on the empirical Tersoff potential was used to simulate the deposition of amorphous silicon and germanium on silicon(111) at various deposition rates and temperatures. The resulting films were analyzed quantitatively by comparing one-dimensional atomic density profiles to experimental measurements. It is found that the simulations are able to capture well the structural features of the deposited films, which exhibit a gradual loss of crystalline order over several monolayers. A simple mechanistic model is used to demonstrate that the simulation temperature may be used to effectively accelerate the surface relaxation processes during deposition, leading to films that are consistent with experimental samples grown at deposition rates many orders-of-magnitude slower than possible in a molecular dynamics simulation.

  5. Electonic properties of hydrogenated amorphous silicon-germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Bullot, J.; Galin, M.; Gauthier, M. (Universite de Paris-Sud, Orsay (France)); Bourdon, B. (CIT-Alcatel Transmission, Marcoussis (France))

    1983-06-01

    The electronic properties of some binary hydrogenated amorphous silicon-germanium alloys a-Sisub(x)Gesub(1-x):H in the silicon rich region (x > 0.6) are investigated. Experimental evidence is presented of photo-induced effects similar to those described in Si:H (Staebler-Wronski effect). The electronic properties are then studied from the dual point of view of the germanium content dependence and of the photo and thermal histories of the films. The dark conductivity changes between the annealed state and the light-soaked state are interpreted in terms of the variation of the temperature coefficient of the Fermi level. The photoconductivity efficiency is shown to remain close to that of a-Si:H for 1 > x >= 0.9 and to strongly decrease when the germanium content is further increased: the photoresponse of the Sisub(0.62)Gesub(0.38) alloy is 10/sup 4/ times smaller than that of a-Si:H. This deterioration of the photoconductive properties is explained in terms of the increase of the density of gap states following Ge substitution. This conclusion is based on the study of the width of the exponential absorption edge and on the results of photoconductivity time response studies. The latter data are interpreted by means of the model of Rose of trapping and recombination kinetics and it is found that for x approximately 0.6 the density of states at 0.4-0.5 eV below the mobility edge is 7 x 10/sup 17/ eV/sup -1/ cm/sup -3/ as compared to 2.4 x 10/sup 16/ eV/sup -1/ cm/sup -3/ for x = 0.97.

  6. Nickel-disilicide-assisted excimer laser crystallization of amorphous silicon

    Institute of Scientific and Technical Information of China (English)

    Liao Yan-Ping; Shao Xi-Bin; Gao Feng-Li; Luo Wen-Sheng; Wu Yuan; Fu Guo-Zhu; Jing Hai; Ma Kai

    2006-01-01

    Polycrystalline silicon (poly-Si) thin film has been prepared by means of nickel-disilicide (NiSi2) assisted excimer laser crystallization (ELC). The process to prepare a sample includes two steps. One step consists of the formation of NiSi2 precipitates by heat-treating the dehydrogenated amorphous silicon (a-Si) coated with a thin layer of Ni. And the other step consists of the formation of poly-Si grains by means of ELC. According to the test results of scanning electron microscopy (SEM), another grain growth model named two-interface grain growth has been proposed to contrast with the conventional Ni-metal-induced lateral crystallization (Ni-MILC) model and the ELC model. That is, an additional grain growth interface other than that in conventional ELC is formed, which consists of NiSi2 precipitates and a-Si.The processes for grain growth according to various excimer laser energy densities delivered to the a-Si film have been discussed. It is discovered that grains with needle shape and most of a uniform orientation are formed which grow up with NiSi2 precipitates as seeds. The reason for the formation of such grains which are different from that of Ni-MILCwithout migration of Ni atoms is not clear. Our model and analysis point out a method to prepare grains with needle shape and mostly of a uniform orientation. If such grains are utilized to make thin-film transistor, its characteristics may be improved.

  7. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    Science.gov (United States)

    Wan, Yimao; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres

    2015-12-01

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiNx) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiNx stack, recombination current density J0 values of 9, 11, 47, and 87 fA/cm2 are obtained on 10 Ω.cm n-type, 0.8 Ω.cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J0 on n-type 10 Ω.cm wafers is further reduced to 2.5 ± 0.5 fA/cm2 when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiNx stack is thermally stable at 400 °C in N2 for 60 min on all four c-Si surfaces. Capacitance-voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiNx stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  8. Amorphous silicon-based PINIP structure for color sensor

    International Nuclear Information System (INIS)

    A series of hydrogenated amorphous silicon carbide (a-SiC:H) films was prepared by plasma enhanced chemical vapor deposition (PECVD) technology. The microstructure and photoelectronic properties of the film are investigated by absorption spectra (in the ultraviolet to near-infrared range) and Fourier transform infrared (FTIR) spectra. The results show that good band gap controllability (1.83-3.64 eV) was achieved by adjusting the plasma parameters. In the energy range around 2.1 eV, the a-Si1-xC x:H films exhibit good photosensitivity, opening the possibility to use this wide band gap material for device application, especially when blue color detectors are concerned. A multilayer device with a stack of glass/TCO(ZnO:Ga)/P(a-SiC:H)/I(a-SiC:H)/N(a-Si:H)/I(a-Si:H)/P(a-Si:H)/Al has been prepared. The devices can detect blue and red colors under different bias voltages. The optimization of the device, especially the film thickness and the band gap offset used to achieve better detectivity, is also done in this work

  9. Diffusion of Gold and Platinum in Amorphous Silicon

    CERN Multimedia

    Voss, T L

    2002-01-01

    By means of radiotracer experiments the diffusion of Au and Pt in radio-frequency-sputtered amorphous silicon (a-Si) was investigated. Specimens of a-Si with homogeneous doping concentrations of Au or Pt in the range 0$\\, - \\,$1,7~at.\\% were produced by co-sputtering of Si and Au or Pt, respectively. An additional tiny concentration of radioactive $^{195}$Au or $^{188}$Pt, about 10~at.ppm, was implanted at ISOLDE. The resulting Gaussian distribution of the implanted atoms served as a probe for measuring diffusion coefficients at various doping concentrations. It was found that for a given doping concentration the diffusion coefficients show Arrhenius-type temperature dependences, where the diffusion enthalpy and the pre-exponential factor depend on the doping concentration. From these results it was concluded that in a-Si Au and Pt undergo direct, interstitial-like diffusion that is retarded by temporary trapping of the radiotracer atoms at vacancy-type defects with different binding enthalpies. In the case o...

  10. Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells

    Science.gov (United States)

    Keya, Kimitaka; Torigoe, Yoshihiro; Toko, Susumu; Yamashita, Daisuke; Seo, Hyunwoong; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu

    2015-09-01

    Light-induced degradation of hydrogenated amorphous silicon (a-Si:H) is a key issue for enhancing competitiveness in solar cell market. A-Si:H films with a lower density of Si-H2 bonds shows higher stability. Here we identified Si-H2 bonds in PIN a-Si:H solar cells fabricated by plasma CVD using Raman spectroscopy. A-Si:H solar cell has a structure of B-doped μc-SiC:H (12.5 nm)/ non-doped a-Si:H (250nm)/ P-doped μc-Si:H (40 nm) on glass substrates (Asahi-VU). By irradiating HeNe laser light from N-layer, peaks correspond to Si-H2 bonds (2100 cm-1) and Si-H bonds (2000 cm-1) have been identified in Raman scattering spectra. The intensity ratio of Si-H2 and Si-H ISiH2/ISiH is found to correlate well to light induced degradation of the cells Therefore, Raman spectroscopy is a promising method for studying origin of light-induced degradation of PIN solar cells.

  11. Carrier transport in amorphous silicon utilizing picosecond photoconductivity

    Science.gov (United States)

    Johnson, A. M.

    1981-08-01

    The development of a high-speed electronic measurement capability permitted the direct observation of the transient photoresponse of amorphous silicon (a-Si) with a time resolution of approximately 10ps. This technique was used to measure the initial mobility of photogenerated (2.1eV) free carriers in three types of a-Si having widely different densities of structural defects (i.e., as prepared by: (1) RF glow discharge (a-Si:H); (2) chemical vapor deposition; and (3) evaporation in ultra-high vacuum). In all three types of a-Si, the same initial mobility of approximately 1 cu cm/Vs at room temperature was found. This result tends to confirm the often-made suggestion that the free carrier mobility is determined by the influence of shallow states associated with the disorder in the random atomic network, and is an intrinsic property of a-Si which is unaffected by the method of preparation. The rate of decay of the photocurrent correlates with the density of structural defects and varies from 4ps to 200ps for the three types of a-Si investigated. The initial mobility of a-Si:H was found to be thermally activated. The possible application of extended state transport controlled by multiple trapping and small polaron formation is discussed.

  12. Hot wire deposited hydrogenated amorphous silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Mahan, A.H.; Iwaniczko, E.; Nelson, B.P.; Reedy, R.C. Jr.; Crandall, R.S. [National Renewable Energy Lab., Golden, CO (United States)

    1996-05-01

    This paper details the results of a study in which low H content, high deposition rate hot wire (HW) deposited amorphous silicon (a-Si:H) has been incorporated into a substrate solar cell. The authors find that the treatment of the top surface of the HW i layer while it is being cooled from its high deposition temperature is crucial to device performance. They present data concerning these surface treatments, and correlate these treatments with Schottky device performance. The authors also present first generation HW n-i-p solar cell efficiency data, where a glow discharge (GD) {mu}c-Si(p) layer was added to complete the partial devices. No light trapping layer was used to increase the device Jsc. Their preliminary investigations have yielded efficiencies of up to 6.8% for a cell with a 4000 {Angstrom} thick HW i-layer, which degrade less than 10% after a 900 hour light soak. The authors suggest avenues for further improvement of their devices.

  13. Nanohole Structuring for Improved Performance of Hydrogenated Amorphous Silicon Photovoltaics.

    Science.gov (United States)

    Johlin, Eric; Al-Obeidi, Ahmed; Nogay, Gizem; Stuckelberger, Michael; Buonassisi, Tonio; Grossman, Jeffrey C

    2016-06-22

    While low hole mobilities limit the current collection and efficiency of hydrogenated amorphous silicon (a-Si:H) photovoltaic devices, attempts to improve mobility of the material directly have stagnated. Herein, we explore a method of utilizing nanostructuring of a-Si:H devices to allow for improved hole collection in thick absorber layers. This is achieved by etching an array of 150 nm diameter holes into intrinsic a-Si:H and then coating the structured material with p-type a-Si:H and a conformal zinc oxide transparent conducting layer. The inclusion of these nanoholes yields relative power conversion efficiency (PCE) increases of ∼45%, from 7.2 to 10.4% PCE for small area devices. Comparisons of optical properties, time-of-flight mobility measurements, and internal quantum efficiency spectra indicate this efficiency is indeed likely occurring from an improved collection pathway provided by the nanostructuring of the devices. Finally, we estimate that through modest optimizations of the design and fabrication, PCEs of beyond 13% should be obtainable for similar devices. PMID:27227369

  14. Deployable aerospace PV array based on amorphous silicon alloys

    Science.gov (United States)

    Hanak, Joseph J.; Walter, Lee; Dobias, David; Flaisher, Harvey

    1989-01-01

    The development of the first commercial, ultralight, flexible, deployable, PV array for aerospace applications is discussed. It is based on thin-film, amorphous silicon alloy, multijunction, solar cells deposited on a thin metal or polymer by a proprietary, roll-to-roll process. The array generates over 200 W at AM0 and is made of 20 giant cells, each 54 cm x 29 cm (1566 sq cm in area). Each cell is protected with bypass diodes. Fully encapsulated array blanket and the deployment mechanism weigh about 800 and 500 g, respectively. These data yield power per area ratio of over 60 W/sq m specific power of over 250 W/kg (4 kg/kW) for the blanket and 154 W/kg (6.5 kg/kW) for the power system. When stowed, the array is rolled up to a diameter of 7 cm and a length of 1.11 m. It is deployed quickly to its full area of 2.92 m x 1.11 m, for instant power. Potential applications include power for lightweight space vehicles, high altitude balloons, remotely piloted and tethered vehicles. These developments signal the dawning of a new age of lightweight, deployable, low-cost space arrays in the range from tens to tens of thousands of watts for near-term applications and the feasibility of multi-100 kW to MW arrays for future needs.

  15. Power change in amorphous silicon technology by low temperature annealing

    Directory of Open Access Journals (Sweden)

    Mittal Ankit

    2015-01-01

    Full Text Available Amorphous silicon (a-Si is one of the best established thin-film solar-cell technologies. Despite its long history of research, it still has many critical issues because of its defect rich material and its susceptibility to degrade under light also called as Staebler-Wronski effect (SWE. This leads to an increase in the defect density of a-Si, but as a metastable effect it can be completely healed at temperatures above 170 °C. Our study is focused on investigating the behavior of annealing of different a-Si modules under low temperature conditions below 80 °C indicated by successive change of module power. These conditions reflect the environmental temperature impact of the modules in the field, or integrated in buildings as well. The power changes were followed by STC power rating and investigation of module-power evolution under low irradiance conditions at 50 W/m2. Our samples were recovered close to their initial state of power, reaching as high as 99% from its degraded value. This shows the influence of low temperature annealing and light on metastable module behavior in a-Si thin-film modules.

  16. Optical position detectors based on thin film amorphous silicon

    Science.gov (United States)

    Henry, Jasmine; Livingstone, John

    2001-10-01

    Thin film optical position sensitive detectors (PSDs) based on novel hydrogenated amorphous silicon Schottky barrier (SB) structures are compared in this work. The three structures reported here have been tested under different light sources to measure their linear properties and wavelength response characteristics. The sputtered a-Si sensors were configured as layered structures of platinum, a-Si and indium tin oxide, forming SB-i-n devices and exhibited linear properties similar to multi-layer a-Si p-i- n devices produced by complex chemical vapor deposition procedures, which involve flammable and toxic gases. All structures were test4ed as possible configurations for 2D sensors. The devices were tested under white light, filtered white light and also a red diode laser. Each of the three structures responded quite differently to each of the sources. Results, based on the correlation coefficient, which measures the linearity of output and which has a maximum value of 1, produced r values ranging between 0.992 to 0.999, in the best performances.

  17. Hydrogenated amorphous silicon thin film anode for proton conducting batteries

    Science.gov (United States)

    Meng, Tiejun; Young, Kwo; Beglau, David; Yan, Shuli; Zeng, Peng; Cheng, Mark Ming-Cheng

    2016-01-01

    Hydrogenated amorphous Si (a-Si:H) thin films deposited by chemical vapor deposition were used as anode in a non-conventional nickel metal hydride battery using a proton-conducting ionic liquid based non-aqueous electrolyte instead of alkaline solution for the first time, which showed a high specific discharge capacity of 1418 mAh g-1 for the 38th cycle and retained 707 mAh g-1 after 500 cycles. A maximum discharge capacity of 3635 mAh g-1 was obtained at a lower discharge rate, 510 mA g-1. This electrochemical discharge capacity is equivalent to about 3.8 hydrogen atoms stored in each silicon atom. Cyclic voltammogram showed an improved stability 300 mV below the hydrogen evolution potential. Both Raman spectroscopy and Fourier transform infrared spectroscopy studies showed no difference to the pre-existing covalent Si-H bond after electrochemical cycling and charging, indicating a non-covalent nature of the Si-H bonding contributing to the reversible hydrogen storage of the current material. Another a-Si:H thin film was prepared by an rf-sputtering deposition followed by an ex-situ hydrogenation, which showed a discharge capacity of 2377 mAh g-1.

  18. Experiment and Simulation Study on the Amorphous Silicon Photovoltaic Walls

    Directory of Open Access Journals (Sweden)

    Wenjie Zhang

    2014-01-01

    Full Text Available Based on comparative study on two amorphous silicon photovoltaic walls (a-Si PV walls, the temperature distribution and the instant power were tested; and with EnergyPlus software, similar models of the walls were built to simulate annual power generation and air conditioning load. On typical sunshine day, the corresponding position temperature of nonventilated PV wall was generally 0.5~1.5°C higher than that of ventilated one, while the power generation was 0.2%~0.4% lower, which was consistent with the simulation results with a difference of 0.41% in annual energy output. As simulation results, in summer, comparing the PV walls with normal wall, the heat per unit area of these two photovoltaic walls was 5.25 kWh/m2 (nonventilated and 0.67 kWh/m2 (ventilated higher, respectively. But in winter the heat loss of nonventilated one was smaller, while ventilated PV wall was similar to normal wall. To annual energy consumption of heating and cooling, the building with ventilated PV wall and normal wall was also similar but slightly better than nonventilated one. Therefore, it is inferred that, at low latitudes, such as Zhuhai, China, air gap ventilation is suitable, while the length to thickness ratio of the air gap needs to be taken into account.

  19. Electrical characterization of hydrogenated amorphous silicon oxide films

    Science.gov (United States)

    Itoh, Takashi; Katayama, Ryuichi; Yamakawa, Koki; Matsui, Kento; Saito, Masaru; Sugiyama, Shuhichiroh; Sichanugrist, Porponth; Nonomura, Shuichi; Konagai, Makoto

    2015-08-01

    The electrical characterization of hydrogenated amorphous silicon oxide (a-SiOx:H) films was performed by electron spin resonance (ESR) and electrical conductivity measurements. In the ESR spectra of the a-SiOx:H films, two ESR peaks with g-values of 2.005 and 2.013 were observed. The ESR peak with the g-value of 2.013 was not observed in the ESR spectra of a-Si:H films. The photoconductivity of the a-SiOx:H films decreased with increasing spin density estimated from the ESR peak with the g-value of 2.005. On the other hand, photoconductivity was independent of spin density estimated from the ESR peak with the g-value of 2.013. The optical absorption coefficient spectra of the a-SiOx:H films were also measured. The spin density estimated from the ESR peak with the g-value of 2.005 increased proportionally with increasing optical absorption owing to the gap-state defect.

  20. Fracture properties of hydrogenated amorphous silicon carbide thin films

    International Nuclear Information System (INIS)

    The cohesive fracture properties of hydrogenated amorphous silicon carbide (a-SiC:H) thin films in moist environments are reported. Films with stoichiometric compositions (C/Si ≈ 1) exhibited a decreasing cohesive fracture energy with decreasing film density similar to other silica-based hybrid organic–inorganic films. However, lower density a-SiC:H films with non-stoichiometric compositions (C/Si ≈ 5) exhibited much higher cohesive fracture energy than the films with higher density stoichiometric compositions. One of the non-stoichiometric films exhibited fracture energy (∼9.5 J m−2) greater than that of dense silica glasses. The increased fracture energy was due to crack-tip plasticity, as demonstrated by significant pileup formation during nanoindentation and a fracture energy dependence on film thickness. The a-SiC:H films also exhibited a very low sensitivity to moisture-assisted cracking compared with other silica-based hybrid films. A new atomistic fracture model is presented to describe the observed moisture-assisted cracking in terms of the limited Si-O-Si suboxide bond formation that occurs in the films.

  1. Amorphization and reduction of thermal conductivity in porous silicon by irradiation with swift heavy ions

    International Nuclear Information System (INIS)

    In this article, we demonstrate that the thermal conductivity of nanostructured porous silicon is reduced by amorphization and also that this amorphous phase in porous silicon can be created by swift (high-energy) heavy ion irradiation. Porous silicon samples with 41%-75% porosity are irradiated with 110 MeV uranium ions at six different fluences. Structural characterisation by micro-Raman spectroscopy and SEM imaging show that swift heavy ion irradiation causes the creation of an amorphous phase in porous Si but without suppressing its porous structure. We demonstrate that the amorphization of porous silicon is caused by electronic-regime interactions, which is the first time such an effect is obtained in crystalline silicon with single-ion species. Furthermore, the impact on the thermal conductivity of porous silicon is studied by micro-Raman spectroscopy and scanning thermal microscopy. The creation of an amorphous phase in porous silicon leads to a reduction of its thermal conductivity, up to a factor of 3 compared to the non-irradiated sample. Therefore, this technique could be used to enhance the thermal insulation properties of porous Si. Finally, we show that this treatment can be combined with pre-oxidation at 300 °C, which is known to lower the thermal conductivity of porous Si, in order to obtain an even greater reduction

  2. Synchrotron applications of an amorphous silicon flat-panel detector

    International Nuclear Information System (INIS)

    A GE Revolution 41RT flat-panel detector (GE 41RT) from GE Healthcare (GE) has been in operation at the Advanced Photon Source for over two years. The detector has an active area of 41 cm x 41 cm with 200 (micro)m x 200 (micro)m pixel size. The nominal working photon energy is around 80 keV. The physical set-up and utility software of the detector system are discussed in this article. The linearity of the detector response was measured at 80.7 keV. The memory effect of the detector element, called lag, was also measured at different exposure times and gain settings. The modulation transfer function was measured in terms of the line-spread function using a 25 (micro)m x 1 cm tungsten slit. The background (dark) signal, the signal that the detector will carry without exposure to X-rays, was measured at three different gain settings and with exposure times of 1 ms to 15 s. The radial geometric flatness of the sensor panel was measured using the diffraction pattern from a CeO2 powder standard. The large active area and fast data-capturing rate, i.e. 8 frames s-1 in radiography mode, 30 frames s-1 in fluoroscopy mode, make the GE 41RT one of a kind and very versatile in synchrotron diffraction. The loading behavior of a Cu/Nb multilayer material is used to demonstrate the use of the detector in a strain-stress experiment. Data from the measurement of various samples, amorphous SiO2 in particular, are presented to show the detector effectiveness in pair distribution function measurements

  3. 14C autoradiography with an energy-sensitive silicon pixel detector

    International Nuclear Information System (INIS)

    The first performance tests are presented of a carbon-14 (14C) beta-particle digital autoradiography system with an energy-sensitive hybrid silicon pixel detector based on the Timepix readout circuit. Timepix was developed by the Medipix2 Collaboration and it is similar to the photon-counting Medipix2 circuit, except for an added time-based synchronization logic which allows derivation of energy information from the time-over-threshold signal. This feature permits direct energy measurements in each pixel of the detector array. Timepix is bump-bonded to a 300 μm thick silicon detector with 256 x 256 pixels of 55 μm pitch. Since an energetic beta-particle could release its kinetic energy in more than one detector pixel as it slows down in the semiconductor detector, an off-line image analysis procedure was adopted in which the single-particle cluster of hit pixels is recognized; its total energy is calculated and the position of interaction on the detector surface is attributed to the centre of the charge cluster. Measurements reported are detector sensitivity, (4.11 ± 0.03) x 10-3 cps mm-2 kBq-1 g, background level, (3.59 ± 0.01) x 10-5 cps mm-2, and minimum detectable activity, 0.0077 Bq. The spatial resolution is 76.9 μm full-width at half-maximum. These figures are compared with several digital imaging detectors for 14C beta-particle digital autoradiography.

  4. Hydrogenated amorphous silicon sensors based on thin film on ASIC technology

    CERN Document Server

    Despeisse, M; Anelli, G; Jarron, P; Kaplon, J; Rusack, R; Saramad, S; Wyrsch, N

    2006-01-01

    The performance and limitations of a novel detector technology based on the deposition of a thin-film sensor on top of processed integrated circuits have been studied. Hydrogenated amorphous silicon (a-Si:H) films have been deposited on top of CMOS circuits developed for these studies and the resulting "thin-film on ASIC" (TFA) detectors are presented. The leakage current of the a-Si:H sensor at high reverse biases turns out to be an important parameter limiting the performance of a TFA detector. Its detailed study and the pixel segmentation of the detector are presented. High internal electric fields (in the order of 10/sup 4/-10/sup 5/ V/cm) can be built in the a-Si:H sensor and overcome the low mobility of electrons and holes in a-Si:H. Signal induction by generated carrier motion and speed in the a-Si:H sensor have been studied with a 660 nm pulsed laser on a TFA detector based on an ASIC integrating 5 ns peaking time pre- amplifiers. The measurement set-up also permits to study the depletion of the senso...

  5. {sup 18}F-FDG positron autoradiography with a particle counting silicon pixel detector

    Energy Technology Data Exchange (ETDEWEB)

    Russo, P; Lauria, A; Mettivier, G; Montesi, M C [Dipartimento di Scienze Fisiche, Universita di Napoli Federico II, and INFN Sezione di Napoli, I-80126 Napoli (Italy); Marotta, M [Dipartimento di Medicina Sperimentale, Universita di Napoli Federico II, I-80131 Napoli (Italy); Aloj, L; Lastoria, S [Medicina Nucleare, Istituto Nazionale per lo Studio e la Cura dei Tumori, Fondazione G. Pascale, I-80131 Napoli (Italy)], E-mail: adele.lauria@na.infn.it

    2008-11-07

    We report on tests of a room-temperature particle counting silicon pixel detector of the Medipix2 series as the detector unit of a positron autoradiography (AR) system, for samples labelled with {sup 18}F-FDG radiopharmaceutical used in PET studies. The silicon detector (1.98 cm{sup 2} sensitive area, 300 {mu}m thick) has high intrinsic resolution (55 {mu}m pitch) and works by counting all hits in a pixel above a certain energy threshold. The present work extends the detector characterization with {sup 18}F-FDG of a previous paper. We analysed the system's linearity, dynamic range, sensitivity, background count rate, noise, and its imaging performance on biological samples. Tests have been performed in the laboratory with {sup 18}F-FDG drops (37-37 000 Bq initial activity) and ex vivo in a rat injected with 88.8 MBq of {sup 18}F-FDG. Particles interacting in the detector volume produced a hit in a cluster of pixels whose mean size was 4.3 pixels/event at 11 keV threshold and 2.2 pixels/event at 37 keV threshold. Results show a sensitivity for {beta}{sup +} of 0.377 cps Bq{sup -1}, a dynamic range of at least five orders of magnitude and a lower detection limit of 0.0015 Bq mm{sup -2}. Real-time {sup 18}F-FDG positron AR images have been obtained in 500-1000 s exposure time of thin (10-20 {mu}m) slices of a rat brain and compared with 20 h film autoradiography of adjacent slices. The analysis of the image contrast and signal-to-noise ratio in a rat brain slice indicated that Poisson noise-limited imaging can be approached in short (e.g. 100 s) exposures, with {approx}100 Bq slice activity, and that the silicon pixel detector produced a higher image quality than film-based AR.

  6. EFFECTS OF ARGON ON THE PROPERTIES OF RF SPUTTERED AMORPHOUS SILICON

    OpenAIRE

    Shao-Qi, Peng; Qai, Yu; Xian, Zhang; Jing, Ye

    1981-01-01

    The Effects of argon on the properties of rf sputtered amorphous silicon film have been investigated. As the sputtering argon pressure is increased from 2 to 20 mTorr, the content of argon in the amorphous silicon film increases apparently (Argon/Silicon : from 10-2 to 5 x 10-2). The other properties measured as a function of argon pressure PAr show that as the PAr is increased, the photoconductivity, resistivity (300K), conductivity activation energy and optical gap increase also, while the ...

  7. Holmium redistribution during solid phase epitaxial crystallization in amorphized silicon layers

    International Nuclear Information System (INIS)

    The concentration profiles of holmium were studied after annealing of silicon layers at 620 deg C. Silicon was implanted with Ho+ ions at 1 MeV energy and (1-3) · 1014 cm-2 doses. Recrystallization of amorphized silicon layer occurs by the mechanism of the solid phase epitaxy. The regularities of segregation redistribution of Ho impurity are similar to the Er redistribution regularities studied earlier. A decrease of Ho concentration at the initial stage of solid phase epitaxial recrystallization is due to a low velocity of mass transport through the crystal-amorphous interface

  8. Experimental study for an intraoperative probe for 18F imaging with a silicon pixel detector

    International Nuclear Information System (INIS)

    Using a silicon pixel detector we have developed an imaging probe for intraoperative detection of tumor masses labeled with 18F-Fluorodeoxyglucose (18FDG) positron emitting radiotracer. The design goal is high efficiency for positron detection from tumor tissue and high rejection of the γ-ray background (511 keV annihilation quanta), coupled to imaging capabilities with submillimeter resolution. In this paper, we report on initial tests of the detector unit (linearity, sensitivity, spatial resolution, γ to β+ ratio), based on a room temperature silicon pixel detector (300 μm thick, ∼2 cm2 sensitive area) with 256x256 pixels of 55 μm pitch, coupled to the Medipix2 readout circuit. The laboratory tests carried out using 18FDG droplets showed counting linearity in the range 37-37,000 Bq, a sensitivity for (γ+β+) of 0.35 cps/Bq, an intrinsic spatial resolution of 230±5 μm with the source in contact with the detector, and a ratio γ/β+ of about 2% due to annihilation quanta

  9. Experimental study for an intraoperative probe for {sup 18}F imaging with a silicon pixel detector

    Energy Technology Data Exchange (ETDEWEB)

    Lauria, A. [Dipartimento di Scienze Fisiche, Universita di Napoli Federico II, I-80126 Naples (Italy) and Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Napoli, I-80126 Naples (Italy)]. E-mail: adele.lauria@na.infn.it; Mettivier, G. [Dipartimento di Scienze Fisiche, Universita di Napoli Federico II, I-80126 Naples (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Napoli, I-80126 Naples (Italy); Montesi, M.C. [Dipartimento di Scienze Fisiche, Universita di Napoli Federico II, I-80126 Naples (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Napoli, I-80126 Naples (Italy); Aloj, L. [Medicina Nucleare, Istituto Nazionale per lo Studio e la Cura dei Tumori, Fondazione G. Pascale, I-80131 Naples (Italy); Lastoria, S. [Medicina Nucleare, Istituto Nazionale per lo Studio e la Cura dei Tumori, Fondazione G. Pascale, I-80131 Naples (Italy); Aurilio, M. [Medicina Nucleare, Istituto Nazionale per lo Studio e la Cura dei Tumori, Fondazione G. Pascale, I-80131 Naples (Italy); Russo, P. [Dipartimento di Scienze Fisiche, Universita di Napoli Federico II, I-80126 Naples (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Napoli, I-80126 Naples (Italy)

    2007-06-11

    Using a silicon pixel detector we have developed an imaging probe for intraoperative detection of tumor masses labeled with {sup 18}F-Fluorodeoxyglucose ({sup 18}FDG) positron emitting radiotracer. The design goal is high efficiency for positron detection from tumor tissue and high rejection of the {gamma}-ray background (511 keV annihilation quanta), coupled to imaging capabilities with submillimeter resolution. In this paper, we report on initial tests of the detector unit (linearity, sensitivity, spatial resolution, {gamma} to {beta}{sup +} ratio), based on a room temperature silicon pixel detector (300 {mu}m thick, {approx}2 cm{sup 2} sensitive area) with 256x256 pixels of 55 {mu}m pitch, coupled to the Medipix2 readout circuit. The laboratory tests carried out using {sup 18}FDG droplets showed counting linearity in the range 37-37,000 Bq, a sensitivity for ({gamma}+{beta}{sup +}) of 0.35 cps/Bq, an intrinsic spatial resolution of 230{+-}5 {mu}m with the source in contact with the detector, and a ratio {gamma}/{beta}{sup +} of about 2% due to annihilation quanta.

  10. Production Of Tandem Amorphous Silicon Alloy Solar Cells In A Continuous Roll-To-Roll Process

    Science.gov (United States)

    Izu, Masat; Ovshinsky, Stanford R.

    1983-09-01

    A roll-to-roll plasma deposition machine for depositing multi-layered amorphous alloys has been developed. The plasma deposition machine (approximately 35 ft. long) has multiple deposition areas and processes 16-inch wide stainless steel substrate continuously. Amorphous photovoltaic thin films (less than 1pm) having a six layered structure (PINPIN) are deposited on a roll of 16-inch wide 1000 ft. long stainless steel substrate, continu-ously, in a single pass. Mass production of low-cost tandem amorphous solar cells utilizing roll-to-roll processes is now possible. A commercial plant utilizing this plasma deposition machine for manufacturing tandem amorphous silicon alloy solar cells is now in operation. At Energy Conversion Devices, Inc. (ECD), one of the major tasks of the photovoltaic group has been the scale-up of the plasma deposition process for the production of amorphous silicon alloy solar cells. Our object has been to develop the most cost effective way of producing amorphous silicon alloy solar cells having the highest efficiency. The amorphous silicon alloy solar cell which we produce has the following layer structure: 1. Thin steel substrate. 2. Multi-layered photovoltaic amorphous silicon alloy layers (approximately 1pm thick; tandem cells have six layers). 3. ITO. 4. Grid pattern. 5. Encapsulant. The deposition of the amorphous layer is technologically the key process. It was clear to us from the beginning of this scale-up program that amorphous silicon alloy solar cells produced in wide width, continuous roll-to-roll production process would be ultimate lowest cost solar cells according to the following reasons. First of all, the material cost of our solar cells is low because: (1) the total thickness of active material is less than 1pm, and the material usage is very small; (2) silicon, fluorine, hydrogen, and other materials used in the device are abundant and low cost; (3) thin, low-cost substrate is used; and (4) product yield is high. In

  11. Fabrication of amorphous silicon nanoribbons by atomic force microscope tip induced local oxidation for thin film device applications

    OpenAIRE

    Pichon, Laurent; Rogel, Regis; Demami, Fouad

    2010-01-01

    WOS International audience We demonstrate the feasibility of induced local oxidation of amorphous silicon by atomic force microscopy. The resulting local oxide is used as mask for the elaboration of thin film silicon resistor. A thin amorphous silicon layer deposited on a glass substrate is locally oxidized following narrow continuous lines. The corresponding oxide line is then used as mask during plasma etching of the amorphous layer leading to the formation of nanoribbon. Such amorpho...

  12. Performance of in-pixel circuits for photon counting arrays (PCAs) based on polycrystalline silicon TFTs

    Science.gov (United States)

    Liang, Albert K.; Koniczek, Martin; Antonuk, Larry E.; El-Mohri, Youcef; Zhao, Qihua; Street, Robert A.; Lu, Jeng Ping

    2016-03-01

    Photon counting arrays (PCAs), defined as pixelated imagers which measure the absorbed energy of x-ray photons individually and record this information digitally, are of increasing clinical interest. A number of PCA prototypes with a 1 mm pixel-to-pixel pitch have recently been fabricated with polycrystalline silicon (poly-Si)—a thin-film technology capable of creating monolithic imagers of a size commensurate with human anatomy. In this study, analog and digital simulation frameworks were developed to provide insight into the influence of individual poly-Si transistors on pixel circuit performance—information that is not readily available through empirical means. The simulation frameworks were used to characterize the circuit designs employed in the prototypes. The analog framework, which determines the noise produced by individual transistors, was used to estimate energy resolution, as well as to identify which transistors contribute the most noise. The digital framework, which analyzes how well circuits function in the presence of significant variations in transistor properties, was used to estimate how fast a circuit can produce an output (referred to as output count rate). In addition, an algorithm was developed and used to estimate the minimum pixel pitch that could be achieved for the pixel circuits of the current prototypes. The simulation frameworks predict that the analog component of the PCA prototypes could have energy resolution as low as 8.9% full width at half maximum (FWHM) at 70 keV; and the digital components should work well even in the presence of significant thin-film transistor (TFT) variations, with the fastest component having output count rates as high as 3 MHz. Finally, based on conceivable improvements in the underlying fabrication process, the algorithm predicts that the 1 mm pitch of the current PCA prototypes could be reduced significantly, potentially to between ~240 and 290 μm.

  13. Stabilization of amorphous structure in silicon thin film by adding germanium

    International Nuclear Information System (INIS)

    The stabilization of the amorphous structure in amorphous silicon film by adding Ge atoms was studied using Raman spectroscopy. Amorphous Si1−xGex (x = 0.0, 0.03, 0.14, and 0.27) films were deposited on glass substrates from electron beam evaporation sources and annealed in N2 atmosphere. The change in the amorphous states and the phase transition from amorphous to crystalline were characterized using the TO, LO, and LA phonons in the Raman spectra. The temperature of the transition from the amorphous phase to the crystalline phase was higher for the a-Si1−xGex (x = 0.03, 0.14) films, and the crystallization was hindered. The reason why the addition of a suitable quantity of Ge atoms into the three-dimensional amorphous silicon network stabilizes its amorphous structure is discussed based on the changes in the Raman signals of the TO, LO, and LA phonons during annealing. The characteristic bond length of the Ge atoms allows them to stabilize the random network of the amorphous Si composed of quasi-tetrahedral Si units, and obstruct its rearrangement

  14. Growth and defect chemistry of amorphous hydrogenated silicon

    Science.gov (United States)

    Scott, Bruce A.; Reimer, Jeffrey A.; Longeway, Paul A.

    1983-12-01

    Magnetic resonance (NMR,EPR) and infrared studies are presented of amorphous hydrogenated silicon (a-Si:H) films prepared by homogeneous chemical vapor deposition (HOMOCVD) and rf plasma decomposition using silane and disilane. Hydrogen incorporation occurs with a small activation energy (˜0.06 eV) for all films, while the barrier for changes in spin defect density is almost an order of magnitude larger and comparable to that measured in defect annealing studies. Films deposited by rf(Si2H6) plasma exhibit the greatest hydrogen contents, followed by HOMOCVD and rf(SiH4) plasma material. NMR measurements suggest that HOMOCVD films are less disordered than plasma-deposited a-Si:H. Previous work and recent kinetic studies of plasma and thermal environments are extensively analyzed, along with thermodynamic and kinetic data, to determine a a-Si:H growth mechanisms most consistent with the experimental results. The model presented to explain compositional and defect changes with substrate temperature emphasizes plasma deposition by monoradical precursors and HOMOCVD growth by diradicals, resulting initially in a similar surface-bound intermediate in all cases. Plasma growth from Si2H6 involves the surface attachment of longer radical chains, compared to SiH4, while oligomeric diradicals could be present in HOMOCVD. The possibility that reactions at the hot reactor wall, as well as in the gas, create monoradicals in HOMOCVD is also explored in detail. Finally, film dehydrogenation and crosslinking reactions are examined, and experiments proposed to determine the channels most relevant for each deposition environment.

  15. Dynamics of hydrogenated amorphous silicon flexural resonators for enhanced performance

    Science.gov (United States)

    Mouro, J.; Chu, V.; Conde, J. P.

    2016-04-01

    Hydrogenated amorphous silicon thin-film flexural resonators with sub-micron actuation gaps are fabricated by surface micromachining on glass substrates. Experimentally, the resonators are electrostatically actuated and their motion is optically detected. Three different configurations for the electrostatic excitation force are used to study the dynamics of the resonators. In the first case, a dc voltage (Vdc) is added to an ac voltage with variable excitation frequency (Vac(ω)) and harmonic, superharmonic, and subharmonic resonances of different orders are observed. The second case consists on mixing the dc voltage (Vdc) with an ac voltage applied at a fixed frequency of twice the natural frequency of the resonator (V(2ω0)). High-amplitude parametric resonance is excited at the natural frequency of the system, ω0. This configuration allows a separation between the frequencies of the excitation and the mechanical motion. Finally, in the third case, the dc voltage (Vdc) is combined with both ac voltages, Vac(ω) and V(2ω0), and parametric resonance is excited and emerges from the fundamental harmonic resonance peak. The single-degree-of-freedom equation of motion is modeled and discussed for each case. The nonlinearity inherent to the electrostatic force is responsible for modulating the spring constant of the system at different frequencies, giving rise to parametric resonance. These equations of motion are simulated in the time and frequency domains, providing a consistent explanation of the experimentally observed phenomena. A wide variety of possible resonance modes with different characteristics can be used advantageously in MEMS device design.

  16. Simulations of a silicon pixel based on MOS Deep Trapping Gate Principle

    CERN Document Server

    Fourches, Nicolas T

    2016-01-01

    The concept of the deep trapping gate device was introduced fairly recently on the basis of technological and transport simulations currently used in the field of classical electron devices. The concept of a buried gate containing localized deep level centers for holes (Deep Trapping Gate or DTG) renders possible the operation of this field effect pixel detector. One alternative to Deep Level introduction is the use of a quantum box, which is a hole quantum-well and an electron barrier. In all of these cases the buried gate modulates the drain-source current. This principle was formerly evaluated with realistic simulations parameters and this shows that a measurable signal is obtained for an energy deposition of a minimum-ionizing particle within a limited silicon thickness. In this work a quantitative study of the response of such a pixel to Minimum Ionizing Particles. The influence of some parameters such as the thickness of the pixel and its lateral dimensions, on the operation of the pixel is studied here...

  17. Fiber Optic Excitation of Silicon Microspheres in Amorphous and Crystalline Fluids

    Science.gov (United States)

    Yılmaz, Huzeyfe; Yılmaz, Hasan; Sharif Murib, Mohammed; Serpengüzel, Ali

    2016-03-01

    This study investigates the optical resonance spectra of free-standing monolithic single crystal silicon microspheres immersed in various amorphous fluids, such as air, water, ethylene glycol, and 4-Cyano-4'-pentylbiphenyl nematic liquid crystal. For the various amorphous fluids, morphology-dependent resonances with quality factors on the order of 105 are observed at 1428 nm. The mode spacing is always on the order of 0.23 nm. The immersion in various amorphous fluids affects the spectral response of the silicon microsphere and heralds this technique for use in novel optofluidics applications. Even though the nematic liquid crystal is a highly birefringent, scattering, and high-index optical medium, morphology-dependent resonances with quality factors on the order of 105 are observed at 1300 nm in the elastic scattering spectra of the silicon microsphere, realizing a liquid-crystal-on-silicon geometry. The relative refractive index and the size parameter of the silicon microsphere are the parameters that affect the resonance structure. The more 4-Cyano-4'-pentylbiphenyl interacting with the silicon microsphere, the lower the quality factor of the resonances is. The more 4-Cyano-4'-pentylbiphenyl is interacting with the silicon microsphere, the lower the mode spacing Δλ of the resonances is. The silicon microspheres wetted with nematic liquid crystal can be used for optically addressed liquid-crystal-on-silicon displays, light valve applications, or reconfigurable optical networks.

  18. Characterization of thin irradiated epitaxial silicon sensors for the CMS phase II pixel 2 upgrade

    International Nuclear Information System (INIS)

    The high-luminosity upgrade of the Large Hadron Collider foreseen around 2023 resulted in the decision to replace the entire tracking system of the CMS experiment. The new pixel detector will be exposed to severe radiation corresponding to 1 MeV neutron equivalent fluence up to φeq ∼ 1016 cm-2 and ionizing dose of ∼ 5 MGy after 3000 fb-1. Thin planar silicon sensors are good candidates to build the pixel detector since the degradation of the signal is less severe than for thicker devices. A study has been carried out in order to characterize highly irradiated planar epitaxial silicon sensors with an active thickness of 100 μm, in addition other silicon materials with a thickness of 200 μm have been studied. The investigation includes pad diodes and strip detectors irradiated up to a fluence of φeq = 1.3 x 1016 cm-2. The diodes have been characterized using laboratory measurements, while measurements have been carried out at the DESY II test beam facility to characterize the charge collection of the strip detectors. In this talk, the results obtained for p-bulk sensors are shown.

  19. Study of the Tracking Method and Expected Performance of the Silicon Pixel Inner Tracker Applied in BESIII

    CERN Document Server

    Xiu, Qinglei; Li, Weidong; Liu, Huaimin; Ma, Qiumei; Ouyang, Qun; Qin, Zhonghua; Wang, Liangliang; Wu, Linghui; Yuan, Ye; Zhang, Yao

    2015-01-01

    The inner drift chamber of the BESIII is encountering serious aging problem after five year's running. For the first layer, the decrease in gas gain is about 26% from 2009 to 2013. The upgrade of the inner tracking detector has become an urgent problem for the BESIII experiment. An inner tracker using CMOS pixel sensors is an important candidate because of its great advantages on spatial resolution and radiation hardness. In order to carry out a Monte Carlo study on the expected performance, a Geant4-based full simulation for the silicon pixel detector has been implemented. The tracking method combining the silicon pixel inner tracker and outer drift chamber has been studied and a preliminary reconstruction software was developed. The Monte Carlo study shows that the performances including momentum resolution, vertex resolution and the tracking efficiency are significantly improved due to the good spatial resolution and moderate material budget of the silicon pixel detector.

  20. Amorphous-silicon module hot-spot testing

    Science.gov (United States)

    Gonzalez, C. C.

    1985-01-01

    Hot spot heating occurs when cell short-circuit current is lower than string operating current. Amorphous cell hot spot are tested to develop the techniques required for performing reverse bias testing of amorphous cells. Also, to quantify the response of amorphous cells to reverse biasing. Guidelines are developed from testing for reducing hot spot susceptibility of amorphous modules and to develop a qualification test for hot spot testing of amorphous modules. It is concluded that amorphous cells undergo hot spot heating similarly to crystalline cells. Comparison of results obtained with submodules versus actual modules indicate heating levels lower in actual modules. Module design must address hot spot testing and hot spot qualification test conducted on modules showed no instabilities and minor cell erosion.

  1. Formation of amorphous silicon by light ion damage

    International Nuclear Information System (INIS)

    Amorphization by implantation of boron ions (which is the lightest element generally used in I.C. fabrication processes) has been systematically studied for various temperatures, various voltages and various dose rates. Based on theoretical considerations and experimental results, a new amorphization model for light and intermediate mass ion damage is proposed consisting of two stages. The role of interstitial type point defects or clusters in amorphization is emphasized. Due to the higher mobility of interstitials out-diffusion to the surface particularly during amorphization with low energy can be significant. From a review of the idealized amorphous structure, diinterstitial-divacancy pairs are suggested to be the embryos of amorphous zones formed during room temperature implantation. The stacking fault loops found in specimens implanted with boron at room temperature are considered to be the origin of secondary defects formed during annealing

  2. Electrical characterization of a radiation-hardened silicon pixel design for CMS

    CERN Document Server

    Xie, X B; Liang, G W; Huang, W; Li, Z; Chien, C Y

    2002-01-01

    We have summarized our R and D on the radiation hardening and handling of high operating voltage for the CMS forward pixel detectors. More radiation-hardened silicon pixel sensors of configuration n sup + /n/p sup + with single-sided multi-guard ring structures have been developed and tested under the radiation environment expected at LHC. In the design, no guard ring is required on the n sup + side and guard rings on the p sup + side are always kept active before and after type inversion. The whole n sup + side is grounded and connected to readout-chip, which greatly simplifies detectors assembling and improves the stability of bump-bonded readout chip on the n sup + side. Samples had been irradiated to high fluence neutron and proton radiations to study the radiation hardness effects. Electrical characteristics such as leakage current, potential distributions over guard rings and full depletion voltage were measured under different temperatures.

  3. Electrical characterization of a radiation-hardened silicon pixel design for CMS

    Science.gov (United States)

    Xie, X. B.; Cho, H. S.; Liang, G. W.; Huang, W.; Li, Z.; Chien, C. Y.

    2002-01-01

    We have summarized our R&D on the radiation hardening and handling of high operating voltage for the CMS forward pixel detectors. More radiation-hardened silicon pixel sensors of configuration n +/n/p + with single-sided multi-guard ring structures have been developed and tested under the radiation environment expected at LHC. In the design, no guard ring is required on the n + side and guard rings on the p + side are always kept active before and after type inversion. The whole n + side is grounded and connected to readout-chip, which greatly simplifies detectors assembling and improves the stability of bump-bonded readout chip on the n + side. Samples had been irradiated to high fluence neutron and proton radiations to study the radiation hardness effects. Electrical characteristics such as leakage current, potential distributions over guard rings and full depletion voltage were measured under different temperatures.

  4. Development of the Pixelated Photon Detector Using Silicon on Insulator Technology for TOF-PET

    CERN Document Server

    Koyama, Akihiro; Takahashi, Hiroyuki; Orita, Tadashi; Arai, Yasuo; Kurachi, Ikuo; Miyoshi, Toshinobu; Nio, Daisuke; Hamasaki, Ryutaro

    2015-01-01

    To measure light emission pattern in scintillator, higher sensitivity and faster response are required to photo detector. Such as single photon avalanche diode (SPAD), conventional pixelated photo detector is operated at Geiger avalanche multiplication. However higher gain of SPAD seems very attractive, photon detection efficiency per unit area is low. This weak point is mainly caused by Geiger avalanche mechanism. To overcome these difficulties, we designed Pixelated Linear Avalanche Integration Detector using Silicon on Insulator technology (SOI-Plaid). To avoid dark count noise and dead time comes from quench circuit, we are planning to use APD in linear multiplication mode. SOI technology enables laminating readout circuit and APD layer, and high-speed and low-noise signal reading regardless smaller gain of linear APD. This study shows design of linear APD by using SOI fabrication process. We designed test element group (TEG) of linear APD and inspected optimal structure of linear APD.

  5. Memory effect under pressure in low density amorphous silicon

    OpenAIRE

    Garg, Nandini; Pandey, K. K.; K. V. Shanavas; Betty, C. A.; Sharma, Surinder M

    2010-01-01

    Our investigations on porous Si show that on increase of pressure it undergoes crystalline phase transitions instead of pressure induced amorphization - claimed earlier, and the amorphous phase appears only on release of pressure. This amorphous phase, when subjected to higher pressures, transforms reversibly to a higher coordinated primitive hexagonal phase showing a kind of memory effect which may be the only example of its kind in the elemental solids. First principles calculations and the...

  6. Reaction of amorphous Ni-W and Ni-N-W films with substrate silicon

    Science.gov (United States)

    Zhu, M. F.; Suni, I.; Nicolet, M.-A.; Sands, T.

    1984-01-01

    Wiley et al. (1982) have studied sputtered amorphous films of Nb-Ni, Mo-Ni, Si-W, and Si-Mo. Kung et al. (1984) have found that amorphous Ni-Mo films as diffusion barriers between multilayer metallizations on silicon demonstrate good electrical and thermal stability. In the present investigation, the Ni-W system was selected because it is similar to the Ni-Mo system. However, W has a higher silicide formation temperature than Mo. Attention is given to aspects of sample preparation, sample characterization, the interaction between amorphous Ni-W films and Si, the crystallization of amorphous Ni(36)W(64) films on SiO2, amorphous Ni-N-W films, silicide formation and phase separation, and the crystallization of amorphous Ni(36)W(64) and Ni(30)N(21)W(49) layers.

  7. New concept of a submillimetric pixellated Silicon detector for intracerebral application

    Energy Technology Data Exchange (ETDEWEB)

    Benoit, M. [Laboratoire de l' Accelerateur Lineaire (LAL, Universite Paris Sud, CNRS/IN2P3, UMR 8608), Orsay (France); Maerk, J.; Weiss, P. [Centre de Physique des Particules de Marseille (CPPM, Universite Aix-Marseille, CNRS/IN2P3, UMR 6550), Marseille (France); Benoit, D. [Imagerie et Modelisation en Neurobiologie et Cancerologie (IMNC, Universite Paris Sud et Paris Diderot, CNRS/IN2P3, IMNC, Centre Universitaire, batiment 440, 91406 Orsay Cedex, UMR 8165), Orsay (France); Clemens, J.C.; Fougeron, D. [Centre de Physique des Particules de Marseille (CPPM, Universite Aix-Marseille, CNRS/IN2P3, UMR 6550), Marseille (France); Janvier, B. [Imagerie et Modelisation en Neurobiologie et Cancerologie (IMNC, Universite Paris Sud et Paris Diderot, CNRS/IN2P3, IMNC, Centre Universitaire, batiment 440, 91406 Orsay Cedex, UMR 8165), Orsay (France); Jevaud, M.; Karkar, S.; Menouni, M. [Centre de Physique des Particules de Marseille (CPPM, Universite Aix-Marseille, CNRS/IN2P3, UMR 6550), Marseille (France); Pain, F.; Pinot, L. [Imagerie et Modelisation en Neurobiologie et Cancerologie (IMNC, Universite Paris Sud et Paris Diderot, CNRS/IN2P3, IMNC, Centre Universitaire, batiment 440, 91406 Orsay Cedex, UMR 8165), Orsay (France); Morel, C. [Centre de Physique des Particules de Marseille (CPPM, Universite Aix-Marseille, CNRS/IN2P3, UMR 6550), Marseille (France); and others

    2011-12-11

    A new beta{sup +} radiosensitive microprobe implantable in rodent brain dedicated to in vivo and autonomous measurements of local time activity curves of beta radiotracers in a volume of brain tissue of a few mm{sup 3} has been developed recently. This project expands the concept of the previously designed beta microprobe, which has been validated extensively in neurobiological experiments performed on anesthetized animals. Due to its limitations considering recordings on awake and freely moving animals, we have proposed to develop a wireless setup that can be worn by an animal without constraining its movements. To that aim, we have chosen a highly beta sensitive Silicon-based detector to devise a compact pixellated probe. Miniaturized wireless electronics is used to read-out and transfer the measurement data. Initial Monte-Carlo simulations showed that high resistive Silicon pixels are appropriate for this purpose, with their dimensions to be adapted to our specific signals. More precisely, we demonstrated that 200 {mu}m thick pixels with an area of 200 {mu}m Multiplication-Sign 500 {mu}m are optimized in terms of beta{sup +}sensitivity versus relative transparency to the gamma background. Based on this theoretical study, we now present the development of the novel sensor, including the system simulations with technology computer-assisted design (TCAD) to investigate specific configurations of guard rings and their potential to increase the electrical isolation and stabilization of the pixel, as well as the corresponding physical tests to validate the particular geometries of this new sensor.

  8. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    Energy Technology Data Exchange (ETDEWEB)

    Wan, Yimao, E-mail: yimao.wan@anu.edu.au; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres [Research School of Engineering, The Australian National University, Canberra, Australian Capital Territory 0200 (Australia)

    2015-12-07

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiN{sub x}) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiN{sub x} stack, recombination current density J{sub 0} values of 9, 11, 47, and 87 fA/cm{sup 2} are obtained on 10 Ω·cm n-type, 0.8 Ω·cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J{sub 0} on n-type 10 Ω·cm wafers is further reduced to 2.5 ± 0.5 fA/cm{sup 2} when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiN{sub x} stack is thermally stable at 400 °C in N{sub 2} for 60 min on all four c-Si surfaces. Capacitance–voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiN{sub x} stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  9. ASIC implementation of a data-push architecture for silicon pixel readout

    International Nuclear Information System (INIS)

    A digital circuit for reading out a silicon pixel array consisting of 64 x 256 elements has been designed. The readout architecture has a data-push sequencing with a throughput of about 200ns/hit. The critical elements of this design have been fabricated through MOSIS using the HP 1.2μm double-metal-single-polysilicon process. Design details of the ASIC and test results are presented. Measurements of interface effects (metastability) between the analog and digital circuit are also presented

  10. Evidence for cascade overlap and grain boundary enhanced amorphization in silicon carbide irradiated with Kr ions

    International Nuclear Information System (INIS)

    Evolution of amorphous domains in silicon carbide with 1 MeV Kr2+ irradiation is investigated using high-resolution transmission electron microscopy and simulations. An unusual morphology of highly curved crystalline/amorphous boundaries is observed in the images, which is identified as a result of cascade overlap and reproduced by a coarse-grained model informed by atomistic simulations. Comparison of local amorphization fractions near grain boundaries and within grain interiors provides experimental evidence for the interstitial starvation mechanism in SiC for the first time. As a competing effect to defect sinks, interstitial starvation increases the rate of local amorphization near grain boundaries and reduces the radiation resistance of nanocrystalline silicon carbide

  11. Effect of light trapping in an amorphous silicon solar cell

    International Nuclear Information System (INIS)

    Light trapping in amorphous silicon based solar cell has been investigated theoretically. The substrate for these cells can be textured, including pyramidally textured c-Si wafer, to improve capture of incident light. A thin silver layer, deposited on the substrate of an n–i–p cell, ultimately goes at the back of the cell structure and can act a back reflector to improve light trapping. The two physical solar cells we investigated had open circuit voltages (Voc) of 0.87, 0.90 V, short circuit current densities (Jsc) of 14.2, 15.36 mA/cm2 respectively. The first cell was investigated for the effect on its performance while having and not having light trapping scheme (LT), when thickness of the active layer (di) was changed in the range of 100 nm to 800 nm. In both the approaches, for having or not having LT, the short circuit current density increases with di while the Voc and fill factor, decreases steadily. However, maximum cell efficiency can be obtained when di = 400 nm, and hence it was considered optimized thickness of the active layer, that was used for further investigation. With the introduction of light trapping to the second cell, it shows a further enhancement in Jsc and red response of the external quantum efficiency to 16.6 mA/cm2 and by 11.1% respectively. Considering multiple passages of light inside the cell, we obtained an improvement in cell efficiency from 9.7% to 10.6%. - Highlights: • A theoretical analysis of light trapping in p–i–n and n–i–p type solar cells • Jsc increases and Voc decreases with the increase in i-layer thickness. • Observed optimized thickness of i-layer as 400 nm • Jsc improved from 15.4 mA/cm2 to 16.6 mA/cm2 due to the light trapping. • Efficiency (η) improved from 9.7% to 10.6% due to better red response of the EQE

  12. Effect of light trapping in an amorphous silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Iftiquar, S.M., E-mail: iftiquar@skku.edu [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Jung, Juyeon; Park, Hyeongsik [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Cho, Jaehyun; Shin, Chonghoon [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Park, Jinjoo [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Jung, Junhee [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Bong, Sungjae [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Kim, Sunbo [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Yi, Junsin, E-mail: yi@yurim.skku.ac.kr [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2015-07-31

    Light trapping in amorphous silicon based solar cell has been investigated theoretically. The substrate for these cells can be textured, including pyramidally textured c-Si wafer, to improve capture of incident light. A thin silver layer, deposited on the substrate of an n–i–p cell, ultimately goes at the back of the cell structure and can act a back reflector to improve light trapping. The two physical solar cells we investigated had open circuit voltages (V{sub oc}) of 0.87, 0.90 V, short circuit current densities (J{sub sc}) of 14.2, 15.36 mA/cm{sup 2} respectively. The first cell was investigated for the effect on its performance while having and not having light trapping scheme (LT), when thickness of the active layer (d{sub i}) was changed in the range of 100 nm to 800 nm. In both the approaches, for having or not having LT, the short circuit current density increases with d{sub i} while the V{sub oc} and fill factor, decreases steadily. However, maximum cell efficiency can be obtained when d{sub i} = 400 nm, and hence it was considered optimized thickness of the active layer, that was used for further investigation. With the introduction of light trapping to the second cell, it shows a further enhancement in J{sub sc} and red response of the external quantum efficiency to 16.6 mA/cm{sup 2} and by 11.1% respectively. Considering multiple passages of light inside the cell, we obtained an improvement in cell efficiency from 9.7% to 10.6%. - Highlights: • A theoretical analysis of light trapping in p–i–n and n–i–p type solar cells • J{sub sc} increases and V{sub oc} decreases with the increase in i-layer thickness. • Observed optimized thickness of i-layer as 400 nm • J{sub sc} improved from 15.4 mA/cm{sup 2} to 16.6 mA/cm{sup 2} due to the light trapping. • Efficiency (η) improved from 9.7% to 10.6% due to better red response of the EQE.

  13. Stable, high-efficiency amorphous silicon solar cells with low hydrogen content

    Science.gov (United States)

    Fortmann, C. M.; Hegedus, S. S.

    1992-12-01

    Results and conclusions obtained during the investigation of amorphous silicon, amorphous silicon based alloy materials, and solar cells fabricated by photo-chemical vapor and glow discharge depositions are reported. Investigation of the effects of the hydrogen content in a-Si:H i-layers in amorphous silicon solar cells show that cells with lowered hydrogen content i-layers are more stable. A classical thermodynamic formulation of the Staebler-Wronski effect has been developed for standard solar cell operating temperatures and illuminations. Methods have been developed to extract a lumped equivalent circuit from the current voltage characteristic of a single junction solar cell in order to predict its behavior in a multijunction device.

  14. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    Directory of Open Access Journals (Sweden)

    Jarmila Mullerova

    2006-01-01

    Full Text Available IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVDon glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silaneplasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra ofhydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. Inthis paper, additional understanding was retrieved from infrared response. Applying standard optical laws, effective mediatheory and Clausius-Mossoti approach concerning the Si-Si and Si-H bonds under IR irradiation as individual oscillators,refractive indices in the long wavelength limit, crystalline, amorphous and voids volume fractions and the mass density of thefilms were determined. The mass density was found to decrease with increasing crystalline volume fraction, which can beattributed to the void-dominated mechanism of network formation.

  15. Applications of microcrystalline hydrogenated cubic silicon carbide for amorphous silicon thin film solar cells

    International Nuclear Information System (INIS)

    We demonstrated the fabrication of n-i-p type amorphous silicon (a-Si:H) thin film solar cells using phosphorus doped microcrystalline cubic silicon carbide (μc-3C-SiC:H) films as a window layer. The Hot-wire CVD method and a covering technique of titanium dioxide TiO2 on TCO was utilized for the cell fabrication. The cell configuration is TCO/TiO2/n-type μc-3C-SiC:H/intrinsic a-Si:H/p-type μc- SiCx (a-SiCx:H including μc-Si:H phase)/Al. Approximately 4.5% efficiency with a Voc of 0.953 V was obtained for AM-1.5 light irradiation. We also prepared a cell with the undoped a-Si1-xCx:H film as a buffer layer to improve the n/i interface. A maximum Voc of 0.966 V was obtained

  16. Programmable SERS active substrates for chemical and biosensing applications using amorphous/crystalline hybrid silicon nanomaterial

    OpenAIRE

    Jeffery Alexander Powell; Krishnan Venkatakrishnan; Bo Tan

    2016-01-01

    We present the creation of a unique nanostructured amorphous/crystalline hybrid silicon material that exhibits surface enhanced Raman scattering (SERS) activity. This nanomaterial is an interconnected network of amorphous/crystalline nanospheroids which form a nanoweb structure; to our knowledge this material has not been previously observed nor has it been applied for use as a SERS sensing material. This material is formed using a femtosecond synthesis technique which facilitates a laser plu...

  17. Electrical properties of amorphous chalcogenide/silicon heterojunctions modified by ion implantation

    OpenAIRE

    Fedorenko, Yanina G.; Hughes, Mark A.; Colaux, Julien L.; Jeynes, C.; Gwilliam, Russell M.; Homewood, Kevin P.; Yao, Jin; Hewak, Dan W.; Lee, Tae-Hoon; Elliott, Stephen R; Gholipour, B.; Curry, Richard J.

    2014-01-01

    Doping of amorphous chalcogenide films of rather dissimilar bonding type and resistivity, namely, Ga-La-S, GeTe, and Ge-Sb-Te by means of ion implantation of bismuth is considered. To characterize defects induced by ion-beam implantation space-charge-limited conduction and capacitance-voltage characteristics of amorphous chalcogenide/silicon heterojunctions are investigated. It is shown that ion implantation introduces substantial defect densities in the films and their interfaces with silico...

  18. Direct simulation of ion beam induced stressing and amorphization of silicon

    OpenAIRE

    Beardmore, Keith M.; Gronbech-Jensen, Niels

    1999-01-01

    Using molecular dynamics (MD) simulation, we investigate the mechanical response of silicon to high dose ion-irradiation. We employ a realistic and efficient model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. We find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, we observe either the ge...

  19. Spectroscopic Ellipsometry Studies of n-i-p Hydrogenated Amorphous Silicon Based Photovoltaic Devices

    OpenAIRE

    Laxmi Karki Gautam; Maxwell M. Junda; Hamna F. Haneef; Collins, Robert W.; Nikolas J. Podraza

    2016-01-01

    Optimization of thin film photovoltaics (PV) relies on characterizing the optoelectronic and structural properties of each layer and correlating these properties with device performance. Growth evolution diagrams have been used to guide production of materials with good optoelectronic properties in the full hydrogenated amorphous silicon (a-Si:H) PV device configuration. The nucleation and evolution of crystallites forming from the amorphous phase were studied using in situ near-infrared to u...

  20. Advances in the development of pixel detector for the SuperB Silicon Vertex Tracker

    International Nuclear Information System (INIS)

    The latest advances in the design and characterization of several pixel sensors developed to satisfy the very demanding requirements of the innermost layer of the SuperB Silicon Vertex Tracker will be presented in this paper. The SuperB machine is an electron positron collider operating at the ϒ(4S) peak to be built in the very near future by the Cabibbo Lab consortium. A pixel detector based on extremely thin, radiation hard devices able to cope with rate in the tens of MHz/cm2 range will be the optimal solution for the upgrade of the inner layer of the SuperB tracking system. At present several options with different levels of maturity are being investigated to understand advantages and potential issues of the different technologies: thin hybrid pixels, Deep N-Well CMOS MAPS, INMAPS CMOS MAPS featuring a quadruple well and high resistivity substrates and CMOS MAPS realized with Vertical Integration technology. The newest results from beam test, the outcomes of the radiation damage studies and the laboratory characterization of the latest prototypes will be reported

  1. Test results on the silicon pixel detector for the TTF-FEL beam trajectory monitor

    Science.gov (United States)

    Hillert, S.; Ischebeck, R.; Müller, U. C.; Roth, S.; Hansen, K.; Holl, P.; Karstensen, S.; Kemmer, J.; Klanner, R.; Lechner, P.; Leenen, M.; Ng, J. S. T.; Schmüser, P.; Strüder, L.

    2001-02-01

    Test measurements on the silicon pixel detector for the beam trajectory monitor at the free-electron laser of the TESLA test facility are presented. To determine the electronic noise of the detector and the read-out electronics and to calibrate the signal amplitude of different pixels, the 6 keV photons of the manganese K α/K β line are used. Two different methods determine the spatial accuracy of the detector: in one setup a laser beam is focused to a straight line and moves across the pixel structure. In the other, the detector is scanned using a low-intensity electron beam of an electron microscope. Both methods show that the symmetry axis of the detector defines a straight line within 0.4 μm. The sensitivity of the detector to low-energy X-rays is measured using a vacuum ultraviolet beam at the synchrotron light source HASYLAB. Additionally, the electron microscope is used to study the radiation hardness of the detector.

  2. 3D silicon pixel detectors for the ATLAS Forward Physics experiment

    CERN Document Server

    Lange, Jörn; Grinstein, Sebastian; Paz, Ivan Lopez

    2015-01-01

    The ATLAS Forward Physics (AFP) project plans to install 3D silicon pixel detectors about 210 m away from the interaction point and very close to the beamline (2-3 mm). This implies the need of slim edges of about 100-200 $\\mu$m width for the sensor side facing the beam to minimise the dead area. Another challenge is an expected non-uniform irradiation of the pixel sensors. It is studied if these requirements can be met using slightly-modified FE-I4 3D pixel sensors from the ATLAS Insertable B-Layer production. AFP-compatible slim edges are obtained with a simple diamond-saw cut. Electrical characterisations and beam tests are carried out and no detrimental impact on the leakage current and hit efficiency is observed. For devices without a 3D guard ring a remaining insensitive edge of less than 15 $\\mu$m width is found. Moreover, 3D detectors are non-uniformly irradiated up to fluences of several 10$^{15}$ n$_{eq}$/cm$^2$ with either a focussed 23 GeV proton beam or a 23 MeV proton beam through holes in Al ma...

  3. Integral silicon pixel-infrared detector on the up-conversion

    International Nuclear Information System (INIS)

    Mathematical modeling of the thermal detector, containing coating absorbing infrared radiation and thermally coupled sensitive element, which constitute microresonator, fulfilling in shape of the closed optical silicon waveguide, are performed. It is shown that the utilizing nontraditional absorbing coatings, made, for example, from the metal-dielectric materials makes it possible to attain the simultaneous increase speed and sensitivity of pixel-infrared detector. Critical parameters of a pixel-detector, providing transformation of the infrared radiation in the spectral range: from 2 μm to 20 μm to the radiation with a wavelength of 1.5 μm are calculated. Principal parameters of a pixel-infrared detector for two types of used absorbing coatings: gold black - frequency of the survey 50 Hz, energy of infrared radiation on the one information channel 7,4 · 10-11 J and SiOx metal-dielectric film with the ratio: SiOx (77 %) and Fe (23 %) - frequency of the survey 100 Hz, energy of infrared radiation on the one information channel 2.45·10-11 J are obtained on the basis of the numerical solution of unsteady one-dimensional heat equation. (authors)

  4. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix.

    Science.gov (United States)

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; Konagai, Makoto

    2014-01-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by HPT; this layer can be easily removed by reactive ion etching. PMID:24521208

  5. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix

    OpenAIRE

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; KONAGAI, MAKOTO

    2014-01-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by ...

  6. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix

    Science.gov (United States)

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; Konagai, Makoto

    2014-02-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by HPT; this layer can be easily removed by reactive ion etching.

  7. Light-induced Voc increase and decrease in high-efficiency amorphous silicon solar cells

    OpenAIRE

    Stuckelberger, Michael; Riesen, Yannick Samuel; Despeisse, Matthieu; Schüttauf, Jan-Willem Alexander; Haug, Franz-Josef; Ballif, Christophe

    2014-01-01

    High-efficiency amorphous silicon (a-Si:H) solar cells were deposited with different thicknesses of the p-type amorphous silicon carbide layer on substrates of varying roughness. We observed a light-induced open-circuit voltage (Voc) increase upon light soaking for thin p-layers, but a decrease for thick p-layers. Further, the Voc increase is enhanced with increasing substrate roughness. After correction of the p-layer thickness for the increased surface area of rough substrates, we can exclu...

  8. Rare-earth Doped Amorphous Silicon Microdisk and Microstadium Resonators with Emission at 1550nm

    CERN Document Server

    Figueira, D S L

    2007-01-01

    Microdisks and microstadium resonators were fabricated on erbium doped amorphous hydrogenated silicon (a-Si:H) layers sandwiched in air and native SiO2 on Si substrates. Annealing condition is optimized to allow large emission at 1550 nm for samples with erbium concentrations as high as 1.02x10^20 atoms/cm3. Near field scanning optical microscopy shows evidences of the simultaneous presence of bow-tie and diamond scars. These modes indicate the high quality of the resonators and the potentiality for achieving amorphous silicon microcavity lasers.

  9. On electronic structure of polymer-derived amorphous silicon carbide ceramics

    Science.gov (United States)

    Wang, Kewei; Li, Xuqin; Ma, Baisheng; Wang, Yiguang; Zhang, Ligong; An, Linan

    2014-06-01

    The electronic structure of polymer-derived amorphous silicon carbide ceramics was studied by combining measurements of temperature-dependent conductivity and optical absorption. By comparing the experimental results to theoretical models, electronic structure was constructed for a carbon-rich amorphous silicon carbide, which revealed several unique features, such as deep defect energy level, wide band-tail band, and overlap between the band-tail band and defect level. These unique features were discussed in terms of the microstructure of the material and used to explain the electric behavior.

  10. The crystallisation of deep amorphous wells in silicon produced by ion implantation

    International Nuclear Information System (INIS)

    The crystallisation of deep amorphous wells is studied. These model systems are formed by high energy self implantation through a mask into silicon. The amorphised regions have an aspect ratio opposite to that employed in previous experiments. At elevated temperatures crystallisation proceeds inwards with the amorphous-phase being transformed through both lateral and vertical solid-phase epitaxy (SPE). Complementary information is obtained from performing plan view and cross-sectional transmission electron microscopy analyses. It is discovered that the recovery of the amorphous material is governed by the dynamics of solid-phase epitaxy and that unique secondary structures result from the heat treatment

  11. Hydrogenated amorphous silicon radiation detectors: Material parameters, radiation hardness, charge collection

    International Nuclear Information System (INIS)

    For nearly two decades now hydrogenated amorphous silicon has generated considerable interest for its potential use in various device applications namely, solar cells, electrolithography, large-area electronics etc. The development of efficient and economic solar cells has been on the forefront of this research. This interest in hydrogenated amorphous silicon has been motivated by the fact that amorphous silicon can be deposited over a large area at relatively low cost compared to crystalline silicon. Hydrogenated amorphous silicon, frequently abbreviated as a-Si:H, used in solar-cell applications is a micron or less thick. The basic device structure is a p-i-n diode where the i layer is the active layer for radiation to interact. This is so because intrinsic a-Si:H has superior electrical properties in comparison to doped a-Si:H which serves the purpose of forming a potential barrier on either end of the i layer. The research presented in this dissertation was undertaken to study the properties of a-Si:H for radiation detection applications in physics and medicine

  12. Characterization of Ni/SnPb-TiW/Pt Flip Chip Interconnections in Silicon Pixel Detector Modules

    CERN Document Server

    Karadzhinova, Aneliya; Härkönen, Jaakko; Luukka, Panja-riina; Mäenpää, Teppo; Tuominen, Eija; Haeggstrom, Edward; Kalliopuska, Juha; Vahanen, Sami; Kassamakov, Ivan

    2014-01-01

    In contemporary high energy physics experiments, silicon detectors are essential for recording the trajectory of new particles generated by multiple simultaneous collisions. Modern particle tracking systems may feature 100 million channels, or pixels, which need to be individually connected to read-out chains. Silicon pixel detectors are typically connected to readout chips by flip-chip bonding using solder bumps. High-quality electro-mechanical flip-chip interconnects minimizes the number of dead read-out channels in the particle tracking system. Furthermore, the detector modules must endure handling during installation and withstand heat generation and cooling during operation. Silicon pixel detector modules were constructed by flip-chip bonding 16 readout chips to a single sensor. Eutectic SnPb solder bumps were deposited on the readout chips and the sensor chips were coated with TiW/Pt thin film UBM (under bump metallization). The modules were assembled at Advacam Ltd, Finland. We studied the uniformity o...

  13. Visualization and analysis of active dopant distribution in a p-i-n structured amorphous silicon solar cell using scanning nonlinear dielectric microscopy

    OpenAIRE

    Hirose, K.; N. Chinone; Cho, Y.

    2015-01-01

    Scanning nonlinear dielectric microscopy (SNDM) and super-higher-order (SHO-) SNDM were used for dopant profiling analysis of a cross-section of the p-i-n structure of an amorphous silicon solar cell. The p-i-n and zigzag structures of each layer boundary were visualized as carrier polarity and density images on 10-20 nm scale through a SNDM measurement. A capacitance-voltage curve was obtained at each pixel in the scan area through a SHO-SNDM measurement. The obtained SNDM and SHO-SNDM data ...

  14. Proton irradiation effects of amorphous silicon solar cell for solar power satellite

    Energy Technology Data Exchange (ETDEWEB)

    Morita, Yousuke; Oshima, Takeshi [Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment; Sasaki, Susumu; Kuroda, Hideo; Ushirokawa, Akio

    1997-03-01

    Flexible amorphous silicon(fa-Si) solar cell module, a thin film type, is regarded as a realistic power generator for solar power satellite. The radiation resistance of fa-Si cells was investigated by the irradiations of 3,4 and 10 MeV protons. The hydrogen gas treatment of the irradiated fa-Si cells was also studied. The fa-Si cell shows high radiation resistance for proton irradiations, compared with a crystalline silicon solar cell. (author)

  15. Computational Evaluation of Amorphous Carbon Coating for Durable Silicon Anodes for Lithium-Ion Batteries

    OpenAIRE

    Jeongwoon Hwang; Jisoon Ihm; Kwang-Ryeol Lee; Seungchul Kim

    2015-01-01

    We investigate the structural, mechanical, and electronic properties of graphite-like amorphous carbon coating on bulky silicon to examine whether it can improve the durability of the silicon anodes of lithium-ion batteries using molecular dynamics simulations and ab-initio electronic structure calculations. Structural models of carbon coating are constructed using molecular dynamics simulations of atomic carbon deposition with low incident energies (1–16 eV). As the incident energy decrease...

  16. Characterisation of edgeless technologies for pixellated and strip silicon detectors with a micro-focused X-ray beam

    Science.gov (United States)

    Bates, R.; Blue, A.; Christophersen, M.; Eklund, L.; Ely, S.; Fadeyev, V.; Gimenez, E.; Kachkanov, V.; Kalliopuska, J.; Macchiolo, A.; Maneuski, D.; Phlips, B. F.; Sadrozinski, H. F.-W.; Stewart, G.; Tartoni, N.; Zain, R. M.

    2013-01-01

    Reduced edge or ``edgeless'' detector design offers seamless tileability of sensors for a wide range of applications from particle physics to synchrotron and free election laser (FEL) facilities and medical imaging. Combined with through-silicon-via (TSV) technology, this would allow reduced material trackers for particle physics and an increase in the active area for synchrotron and FEL pixel detector systems. In order to quantify the performance of different edgeless fabrication methods, 2 edgeless detectors were characterized at the Diamond Light Source using an 11 μm FWHM 15 keV micro-focused X-ray beam. The devices under test were: a 150 μm thick silicon active edge pixel sensor fabricated at VTT and bump-bonded to a Medipix2 ROIC; and a 300 μm thick silicon strip sensor fabricated at CIS with edge reduction performed by SCIPP and the NRL and wire bonded to an ALiBaVa readout system. Sub-pixel resolution of the 55 μm active edge pixels was achieved. Further scans showed no drop in charge collection recorded between the centre and edge pixels, with a maximum deviation of 5% in charge collection between scanned edge pixels. Scans across the cleaved and standard guard ring edges of the strip detector also show no reduction in charge collection. These results indicate techniques such as the scribe, cleave and passivate (SCP) and active edge processes offer real potential for reduced edge, tiled sensors for imaging detection applications.

  17. Characterisation of edgeless technologies for pixellated and strip silicon detectors with a micro-focused X-ray beam

    International Nuclear Information System (INIS)

    Reduced edge or ''edgeless'' detector design offers seamless tileability of sensors for a wide range of applications from particle physics to synchrotron and free election laser (FEL) facilities and medical imaging. Combined with through-silicon-via (TSV) technology, this would allow reduced material trackers for particle physics and an increase in the active area for synchrotron and FEL pixel detector systems. In order to quantify the performance of different edgeless fabrication methods, 2 edgeless detectors were characterized at the Diamond Light Source using an 11 μm FWHM 15 keV micro-focused X-ray beam. The devices under test were: a 150 μm thick silicon active edge pixel sensor fabricated at VTT and bump-bonded to a Medipix2 ROIC; and a 300 μm thick silicon strip sensor fabricated at CIS with edge reduction performed by SCIPP and the NRL and wire bonded to an ALiBaVa readout system. Sub-pixel resolution of the 55 μm active edge pixels was achieved. Further scans showed no drop in charge collection recorded between the centre and edge pixels, with a maximum deviation of 5% in charge collection between scanned edge pixels. Scans across the cleaved and standard guard ring edges of the strip detector also show no reduction in charge collection. These results indicate techniques such as the scribe, cleave and passivate (SCP) and active edge processes offer real potential for reduced edge, tiled sensors for imaging detection applications.

  18. First operation of a hybrid photon detector prototype with electrostatic cross-focussing and integrated silicon pixel readout

    CERN Document Server

    Alemi, M; Gys, Thierry; Mikulec, B; Piedigrossi, D; Puertolas, D; Rosso, E; Schomaker, R; Snoeys, W; Wyllie, Ken H

    2000-01-01

    We report on the first operation of a hybrid photon detector prototype with integrated silicon pixel readout for the ring imaging Cherenkov detectors of the LHCb experiment. The photon detector is based on a cross-focussed image intensifier tube geometry where the image is de-magnified by a factor of 4. The anode consists of a silicon pixel array, bump-bonded to a binary readout chip with matching pixel electronics. The prototype has been characterized using a low-intensity light-emitting diode operated in pulsed mode. Its performance in terms of single-photoelectron detection efficiency and imaging properties is presented. A model of photoelectron detection is proposed, and is shown to be in good agreement with the experimental data. It includes an estimate of the charge signal generated in the silicon detector, and the combined effects of the comparator threshold spread of the pixel readout chip, charge sharing at the pixel boundaries and back-scattering of the photoelectrons at the silicon detector surface...

  19. Effect of phosphorus ion implantation on crystallization of amorphous silicon films under exposure to excimer laser radiation pulses

    International Nuclear Information System (INIS)

    The effect of implanted phosphorus ions on the crystallization of thin amorphous silicon films under the action of nanosecond radiation pulses of a XeCl excimer laser is studied. The amorphous silicon films with a thickness of 90 nm on glass substrates, were implanted with phosphorus ions at a dose of 3 x 1014 and 3 x 1015 cm-2. The subsequent laser treatments were performed using energies both above and below a threshold corresponding to the fusion of amorphous silicon. The structure of the silicon films was studied using Raman spectroscopy. The conclusion is made that implanted phosphorus stimulates nucleation, especially in the case of liquid phase crystallization

  20. A simple approach to using an amorphous silicon EPID to verify IMRT planar dose maps

    International Nuclear Information System (INIS)

    A simplified method of verifying intensity modulated radiation therapy (IMRT) fields using a Varian aS500 amorphous silicon electronic portal imaging device (EPID) is demonstrated. Unlike previous approaches, it does not involve time consuming or complicated analytical processing of the data. The central axis pixel response of the EPID, as well as the profile characteristics obtained from images acquired with a 6 MV photon beam, was examined as a function of field size. Ion chamber measurements at various depths in a water phantom were then collected and it was found that at a specific depth dref, the dose response and profile characteristics closely matched the results of the EPID analysis. The only manipulation required to be performed on the EPID images was the multiplication of a matrix of off axis ratio values to remove the effect of the flood field calibration. Similarly, dref was found for 18 MV. Planar dose maps at dref in a water phantom for a bar pattern, a strip pattern, and 14 clinical IMRT fields from two patient cases each being from a separate anatomical region, i.e., head and neck as well as the pelvis, for both energies were generated by the Pinnacle planning system (V7.4). EPID images of these fields were acquired and converted to planar dose maps and compared directly with the Pinnacle planar dose maps. Radiographic film dosimetry and a MapCHECK dosimetry device (Sun Nuclear Corporation, Melbourne, FL) were used as an independent verification of the dose distribution. Gamma analysis of the EPID, film, and Pinnacle planar dose maps generated for the clinical IMRT fields showed that approximately 97% of all points passed using a 3% dose/3mm DTA tolerance test. Based on the range of fields studied, the author's results appear to justify using this approach as a method to verify dose distributions calculated on a treatment planning system, including complex intensity modulated fields.

  1. Amorphous silicon p-i-n photodetector with Frisch grid for high-speed medical imaging

    Science.gov (United States)

    Allec, Nicholas; Goldan, Amir H.; Wang, Kai; Chen, Feng; Karim, Karim S.

    2010-04-01

    In indirect digital x-ray detectors, photodetectors such as hydrogenated amorphous silicon (a-Si:H) p-i-n photodetectors are used to convert the optical photons generated by the scintillating material to collectible electron-hole pairs. A problem that arises during the collection of the charges is that the mobility and lifetime of both types of carriers (electrons and holes) differ. In a-Si:H, the mobility of holes is much lower than that of electrons which leads to depth-dependent signal variations and causes the charge collection time to be extensive. It has been shown that the use of a Frisch grid can reduce the effect of the slower carriers in direct x-ray detectors. The Frisch grid is essentially a conducting grid that shields carriers from the collecting electrode until they are in close proximity. When the pixel electrodes are properly biased, the grid prevents the slow moving carriers (traveling away from the collecting electrode) from being collected and puts more weight on the fast moving carriers, thus allowing the total charge to be collected in less time. In this paper we investigate the use of a Frisch grid in a-Si:H p-i-n photodetectors for indirect x-ray detectors. Through simulations and theoretical analysis we determine the grid line sizes and positioning that will be most effective for practical p-i-n photodetector designs. In addition we compare the results of photodetectors with and without the grid to characterize the improvement achievable.

  2. Field Emission from Amorphous carbon Nitride Films Deposited on silicon Tip Arrays

    Institute of Scientific and Technical Information of China (English)

    李俊杰; 郑伟涛; 孙龙; 卞海蛟; 金曾孙; 赵海峰; 宋航; 孟松鹤; 赫晓东; 韩杰才

    2003-01-01

    Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx films. In addition, the films deposited on silicon tips have a smaller effective work function ( F = 0.024 eV)of electron field emission than that on silicon wafer ( F = 0.060 e V), which indicates a significant enhancement of the ability of electron field emission from a-CNx films.

  3. Crystal-amorphous-silicon interface kinetics under ion beam irradiation

    Science.gov (United States)

    Priolo, F.; La Ferla, A.; Spinella, C.; Rimini, E.; Campisano, S. U.; Ferla, G.

    1990-01-01

    Our recent work on ion-beam-assisted epitaxial growth of amorphous Si layers on single crystal substrates is reviewed. The crystallization was induced by a 600 keV Kr2+ beam at a dose rate of 1×1012/cm2 · s. During irradiations the samples were mounted on a resistively heated copper block whose temperature was maintained constant in the range 250-450°C. The planar motion of the crystal-amorphous interface was monitored in situ by dynamic reflectivity measurements. This technique allows the ion-induced growth rate to be measured with a very high precision. We have observed that this growth rate scales linearly with the energy deposited into elastic collisions at the crystal-amorphous interface by the impinging ions. Moreover, the rate shows an Arrhenius temperature dependence with a well defined activation energy of 0.32±0.05 eV. The dependence of this process on substrate orientation and on impurities either dissolved in the amorphous layer or present at very high concentration at the crystal-amorphous interface is also discussed.

  4. Crystalline-amorphous silicon nano-composites: Nano-pores and nano-inclusions impact on the thermal conductivity

    Science.gov (United States)

    Verdier, M.; Termentzidis, K.; Lacroix, D.

    2016-05-01

    The thermal conductivities of nanoporous and nanocomposite silicon with incorporated amorphous phases have been computed by molecular dynamics simulations. A systematic investigation of the porosity and the width of the amorphous shell contouring a spherical pore has been made. The impact of amorphous phase nanoinclusions in a crystalline matrix has also been studied with the same amorphous fraction as the porosity of nanoporous silicon to achieve comparison. The key parameter for all configurations with or without the amorphous phase is proved to be the interface (between the crystalline and amorphous phases or crystalline and void) to volume ratio. We obtain the sub-amorphous thermal conductivity for several configurations by combining pores, amorphous shell, and crystalline phase. These configurations are promising candidates for low cost and not toxic thermoelectric devices based on abundant semiconductors.

  5. Design of a radiation hard silicon pixel sensor for X-ray science

    International Nuclear Information System (INIS)

    At DESY Hamburg the European X-ray Free-Electron Laser (EuXFEL) is presently under construction. The EuXFEL has unique properties with respect to X-ray energy, instantaneous intensity, pulse length, coherence and number of pulses/sec. These properties of the EuXFEL pose very demanding requirements for imaging detectors. One of the detector systems which is currently under development to meet these challenges is the Adaptive Gain Integrating Pixel Detector, AGIPD. It is a hybrid pixel-detector system with 1024 x 1024 p+ pixels of dimensions 200 μm x 200 μm, made of 16 p+nn+- silicon sensors, each with 10.52 cm x 2.56 cm sensitive area and 500 μm thickness. The particular requirements for the AGIPD are a separation between noise and single photons down to energies of 5 keV, more than 104 photons per pixel for a pulse duration of less than 100 fs, negligible pile-up at the EuXFEL repetition rate of 4.5 MHz, operation for X-ray doses up to 1 GGy, good efficiency for X-rays with energies between 5 and 20 keV, and minimal inactive regions at the edges. The main challenge in the sensor design is the required radiation tolerance and high operational voltage, which is required to reduce the so-called plasma effect. This requires a specially optimized sensor. The X-ray radiation damage results in a build-up of oxide charges and interface traps which lead to a reduction of the breakdown voltage, increased leakage current, increased interpixel capacitances and charge losses. Extensive TCAD simulations have been performed to understand the impact of X-ray radiation damage on the detector performance and optimize the sensor design. To take radiation damage into account in the simulation, radiation damage parameters have been determined on MOS capacitors and gate-controlled diodes as function of dose. The optimized sensor design was fabricated by SINTEF. Irradiation tests on test structures and sensors show that the sensor design is radiation hard and performs as predicted by

  6. Electrical and optical properties of thin film of amorphous silicon nanoparticles

    International Nuclear Information System (INIS)

    Electrical and optical properties of thin film of amorphous silicon nanoparticles (a-Si) are studied. Thin film of silicon is synthesized on glass substrate under an ambient gas (Ar) atmosphere using physical vapour condensation system. We have employed Field Emission Scanning Electron Microscopy (FESEM), Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM) to study the morphology and microstructure of this film. It is observed that this silicon film contains almost spherical nanoparticles with size varying between 10 and 40 nm. The average surface roughness is about 140 nm as evident from the AFM image. X-ray diffraction analysis is also performed. The XRD spectrum does not show any significant peak which indicates the amorphous nature of the film. To understand the electrical transport phenomena, the temperature dependence of dc conductivity for this film is studied over a temperature range of (300-100 K). On the basis of temperature dependence of dc conductivity, it is suggested that the conduction takes place via variable range hopping (VRH). Three-dimensional Mott's variable range hopping (3D VRH) is applied to explain the conduction mechanism for the transport of charge carriers in this system. Various Mott's parameters such as density of states, degree of disorder, hopping distance, hopping energy are estimated. In optical properties, we have studied Fourier transform infra-red spectra and the photoluminescence of this amorphous silicon thin film. It is found that these amorphous silicon nanoparticles exhibits strong Si-O-Si stretching mode at 1060 cm-1, which suggests that the large amount of oxygen is adsorbed on the surface of these a-Si nanoparticles. The photoluminescence observed from these amorphous silicon nanoparticles has been explained with the help of oxygen related surface state mechanism.

  7. Crystallization mechanism of silicon quantum dots upon thermal annealing of hydrogenated amorphous Si-rich silicon carbide films

    International Nuclear Information System (INIS)

    We have investigated the crystallization process of silicon quantum dots (QDs) imbedded in hydrogenated amorphous Si-rich silicon carbide (a-SiC:H) films. Analysis reveals that crystallization of silicon QDs upon thermal annealing of the samples can be explained in terms of bonding configuration and evolution of microstructure. The precursor gases were dissociated via electron impact reactions in the plasma-enhanced chemical vapor deposition, where the hydrogenated silicon radicals and reactive SiHn species lead to the formation of primary Si nuclei. With increasing annealing temperature, the breaking of SiHn bonds and decomposition of Si-rich SiC were progressively enhanced, allowing the formation of crystalline silicon QDs inside the a-SiC:H matrix. The results help clarify a probable mechanism for the growth of silicon QDs and provide the possibility to optimize the microstructure of silicon QDs in a-SiC:H films. - Highlights: • Si-rich SiC samples are grown by plasma-enhanced chemical vapor deposition. • Silicon radicals and reactive SiHn (n = 1,2,3) exist in the as-grown samples. • Annealing temperature induces the growth of crystalline silicon quantum dots. • Carbon atoms are incorporated in the formation of Si-C and C-H bonds in the matrix

  8. Direct Simulation of Ion Beam Induced Stressing and Amorphization of Silicon

    International Nuclear Information System (INIS)

    Using molecular dynamics (MD) simulation, the authors investigate the mechanical response of silicon to high dose ion-irradiation. The authors employ a realistic model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. The authors find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, the authors observe either the generation of a high compressive stress and subsequent expansion of the material, or generation of tensile stress and densification. The authors note that statistical material properties, such as radial distribution functions are not sufficient to differentiate between the different densities of the amorphous samples. For any reasonable deformation rate, the authors observe an expansion of the target upon amorphization in agreement with experimental observations. This is in contrast to simulations of quenching which usually result in a denser structure relative to crystalline Si. The authors conclude that although there is substantial agreement between experimental measurements and simulation results, the amorphous structures being investigated may have fundamental differences; the difference in density can be attributed to local defects within the amorphous network. Finally the authors show that annealing simulations of their amorphized samples can lead to a reduction of high energy local defects without a large scale rearrangement of the amorphous network. This supports the proposal that defects in a-Si are analogous to those in c-Si

  9. Direct Simulation of Ion Beam Induced Stressing and Amorphization of Silicon

    Energy Technology Data Exchange (ETDEWEB)

    Beardmore, K.M.; Gronbech-Jensen, N.

    1999-05-02

    Using molecular dynamics (MD) simulation, the authors investigate the mechanical response of silicon to high dose ion-irradiation. The authors employ a realistic model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. The authors find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, the authors observe either the generation of a high compressive stress and subsequent expansion of the material, or generation of tensile stress and densification. The authors note that statistical material properties, such as radial distribution functions are not sufficient to differentiate between the different densities of the amorphous samples. For any reasonable deformation rate, the authors observe an expansion of the target upon amorphization in agreement with experimental observations. This is in contrast to simulations of quenching which usually result in a denser structure relative to crystalline Si. The authors conclude that although there is substantial agreement between experimental measurements and simulation results, the amorphous structures being investigated may have fundamental differences; the difference in density can be attributed to local defects within the amorphous network. Finally the authors show that annealing simulations of their amorphized samples can lead to a reduction of high energy local defects without a large scale rearrangement of the amorphous network. This supports the proposal that defects in a-Si are analogous to those in c-Si.

  10. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    International Nuclear Information System (INIS)

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiCx) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiCx/SiO2/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiCx, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiCx can promote the application of Si QDs in low-power consumption semiconductor memory devices

  11. Etching characteristics of hydrogenated amorphous silicon and poly crystalline silicon by hydrogen hyperthermal neutral beam

    International Nuclear Information System (INIS)

    A hydrogen hyperthermal neutral beam (HNB) generated by an inclined slot-excited antenna electron cyclotron resonance plasma source has been used to etch hydrogenated amorphous silicon (a-Si:H) and polycrystalline silicon (poly-Si) films. In this work, we present selective etching of a-Si:H with respect to poly-Si by hydrogen plasma and hydrogen HNB under various substrate temperatures, gas pressures, and bias voltages of the neutralizer. We have observed that the etch rate of a-Si:H is considerably higher than that of poly-Si. The etch rate is largely dependent upon the substrate temperature. In this experiment, the optimal substrate temperature for improving the etch rate is approximately at 150 °C. The root mean square surface roughness of the etched material reaches a maximum at 150 °C and decreases rapidly. The etch rate of poly-Si is not sensitive to changes in the experimental condition, such as the substrate temperatures and gas pressures. However, as the hydrogen HNB energy is increased, the etch rate of poly-Si also increases gradually. The hydrogen HNB energy contributes in improving the etch rate of a-Si:H and poly-Si films. - Highlights: • The highest etch rate is shown to be at the substrate temperature of 150 °C. • We investigated the effects of hydrogen hyperthermal neutral beam (HNB) energy. • Increasing HNB energy shows an increase in the etch rate of the poly-Si and a-Si:H

  12. Etching characteristics of hydrogenated amorphous silicon and poly crystalline silicon by hydrogen hyperthermal neutral beam

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Seung Pyo; Kim, Jongsik; Park, Jong-Bae; Oh, Kyoung Suk; Kim, Young-Woo; Yoo, Suk Jae; Kim, Dae Chul, E-mail: dchcharm@nfri.re.kr

    2015-03-31

    A hydrogen hyperthermal neutral beam (HNB) generated by an inclined slot-excited antenna electron cyclotron resonance plasma source has been used to etch hydrogenated amorphous silicon (a-Si:H) and polycrystalline silicon (poly-Si) films. In this work, we present selective etching of a-Si:H with respect to poly-Si by hydrogen plasma and hydrogen HNB under various substrate temperatures, gas pressures, and bias voltages of the neutralizer. We have observed that the etch rate of a-Si:H is considerably higher than that of poly-Si. The etch rate is largely dependent upon the substrate temperature. In this experiment, the optimal substrate temperature for improving the etch rate is approximately at 150 °C. The root mean square surface roughness of the etched material reaches a maximum at 150 °C and decreases rapidly. The etch rate of poly-Si is not sensitive to changes in the experimental condition, such as the substrate temperatures and gas pressures. However, as the hydrogen HNB energy is increased, the etch rate of poly-Si also increases gradually. The hydrogen HNB energy contributes in improving the etch rate of a-Si:H and poly-Si films. - Highlights: • The highest etch rate is shown to be at the substrate temperature of 150 °C. • We investigated the effects of hydrogen hyperthermal neutral beam (HNB) energy. • Increasing HNB energy shows an increase in the etch rate of the poly-Si and a-Si:H.

  13. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    Energy Technology Data Exchange (ETDEWEB)

    Wen, Xixing; Zeng, Xiangbin, E-mail: eexbzeng@163.com; Zheng, Wenjun; Liao, Wugang [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Feng, Feng [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Shenzhen Institute of Huazhong University of Science and Technology, Shenzhen 518000 (China)

    2015-01-14

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiC{sub x}) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiC{sub x}/SiO{sub 2}/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiC{sub x}, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiC{sub x} can promote the application of Si QDs in low-power consumption semiconductor memory devices.

  14. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    Science.gov (United States)

    Wen, Xixing; Zeng, Xiangbin; Zheng, Wenjun; Liao, Wugang; Feng, Feng

    2015-01-01

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiCx) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiCx/SiO2/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiCx, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiCx can promote the application of Si QDs in low-power consumption semiconductor memory devices.

  15. Amorphous Silicon Position Detectors for the Link Alignment System of the CMS Detector: Users Handbook

    Energy Technology Data Exchange (ETDEWEB)

    Calderon, A.; Gomez, G.; Gonzalez-Sanchez, F. J.; Martinez-Rivero, C.; Matorras, F.; Rodrigo, T.; Ruiz-Arbol, P.; Scodellaro, L.; Vila, I.; Virto, A. L.; Alberdi, J.; Arce, P.; Barcala, J.M.; Calvo, E.; Ferrando, A.; Josa, M. I.; Molinero, A.; Navarrete, J.; Oller, J. C.; Yuste, C.

    2007-07-01

    We present the general characteristics, calibration procedures and measured performance of the Amorphous Silicon Position Detectors installed in the Link Alignment System of the CMS Detector for laser beam detection and reconstruction and give the Data Base to be used as a Handbook during CMS operation. (Author) 10 refs.

  16. Preliminary radiation tests of 32 μm thick hydrogenated amorphous silicon films

    International Nuclear Information System (INIS)

    Preliminary radiation tests of hydrogenated amorphous silicon n-i-p photodiodes deposited on a coated glass substrate are presented in this paper. These tests have been performed using a 24 GeV proton beam. We report results on the fluence dependence of the diode dark current and of the signal induced by a proton spill

  17. Preliminary radiation tests of 32 {mu}m thick hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Despeisse, M. [CERN, 1211 Geneva 23 (Switzerland)]. E-mail: matthieu.despeisse@cern.ch; Jarron, P. [CERN, 1211 Geneva 23 (Switzerland); Johansen, K.M. [CERN, 1211 Geneva 23 (Switzerland); Moraes, D. [CERN, 1211 Geneva 23 (Switzerland); Shah, A. [IMT, rue A.L Breguet 2, CH-2000 Neuchatel (Switzerland); Wyrsch, N. [IMT, rue A.L Breguet 2, CH-2000 Neuchatel (Switzerland)

    2005-10-21

    Preliminary radiation tests of hydrogenated amorphous silicon n-i-p photodiodes deposited on a coated glass substrate are presented in this paper. These tests have been performed using a 24 GeV proton beam. We report results on the fluence dependence of the diode dark current and of the signal induced by a proton spill.

  18. Thermal ideality factor of hydrogenated amorphous silicon p-i-n solar cells

    NARCIS (Netherlands)

    Kind, R.; Van Swaaij, R.A.C.M.M.; Rubinelli, F.A.; Solntsev, S.; Zeman, M.

    2011-01-01

    The performance of hydrogenated amorphous silicon (a-Si:H) p-i-n solar cells is limited, as they contain a relatively high concentration of defects. The dark current voltage (JV) characteristics at low forward voltages of these devices are dominated by recombination processes. The recombination rate

  19. Test Results of the Semi-transparent Amorphous Silicon Sensors for the Link System of CMS

    CERN Document Server

    Fernández, Marcos; Figueroa, Carlos; García, N; Josa-Mutuberria, I; Molinero, Antonio; Oller, Juan Carlos; Rodrigo, Teresa; Vila, Ivan

    1998-01-01

    Semitransparent amorphous silicon sensors have been proposed as the 2D positioning sensors for the link system of the CMS alignment. We have developed a general method to characterise these sensors from the signal reconstruction to the beam deflection. The transparency for the HeNe wavelength has also been calculated.

  20. Amorphous Silicon Position Detectors for the Link Alignment System of the CMS Detector: Users Handbook

    International Nuclear Information System (INIS)

    We present the general characteristics, calibration procedures and measured performance of the Amorphous Silicon Position Detectors installed in the Link Alignment System of the CMS Detector for laser beam detection and reconstruction and give the Data Base to be used as a Handbook during CMS operation. (Author) 10 refs

  1. A comparison of degradation in three amorphous silicon PV module technologies

    Energy Technology Data Exchange (ETDEWEB)

    Radue, C.; van Dyk, E.E. [Physics Department, PO Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa)

    2010-03-15

    Three commercial amorphous silicon modules manufactured by monolithic integration and consisting of three technology types were analysed in this study. These modules were deployed outdoors for 14 months and underwent degradation. All three modules experienced the typical light-induced degradation (LID) described by the Staebler-Wronski effect, and this was followed by further degradation. A 14 W single junction amorphous silicon module degraded by about 45% of the initial measured maximum power output (P{sub MAX}) at the end of the study. A maximum of 30% of this has been attributed to LID and the further 15% to cell mismatch and cell degradation. The other two modules, a 64 W triple junction amorphous silicon module, and a 68 W flexible triple junction amorphous silicon module, exhibited LID followed by seasonal variation in the degraded P{sub MAX}. The 64 W module showed a maximum degradation in P{sub MAX} of about 22%. This is approximately 4% more than the manufacturer allowed for the initial LID. However, the seasonal variation in P{sub MAX} seems to be centred around the manufacturer's rating ({+-}4%). The 68 W flexible module has shown a maximum decrease in P{sub MAX} of about 27%. This decrease is about 17% greater than the manufacturer allowed for the initial LID. (author)

  2. Nonlinear properties of and nonlinear processing in hydrogenated amorphous silicon waveguides

    DEFF Research Database (Denmark)

    Kuyken, B.; Ji, Hua; Clemmen, S.;

    2011-01-01

    We propose hydrogenated amorphous silicon nanowires as a platform for nonlinear optics in the telecommunication wavelength range. Extraction of the nonlinear parameter of these photonic nanowires reveals a figure of merit larger than 2. It is observed that the nonlinear optical properties of these...

  3. Amorphous silicon research. Annual subcontract report, October 1, 1994--September 30, 1995

    Energy Technology Data Exchange (ETDEWEB)

    Arya, R R; Bennett, M; Bradley, D [and others

    1996-02-01

    The major effort in this program is to develop cost-effective processes which satisfy efficiency, yield, and material usage criteria for mass production of amorphous silicon-based multijunction modules. New and improved processes were developed for the component cells and a more robust rear contact was developed for better long term stability.

  4. Preparation and Characterisation of Amorphous-silicon Photovoltaic Devices Having Microcrystalline Emitters

    International Nuclear Information System (INIS)

    The present work summarises the essential aspects of the research carried out so far at CIEMAT on amorphous-silicon solar cells. The experience accumulated on the preparation and characterisation of amorphous and microcrystalline silicon has allowed to start from intrinsic (absorbent) and p- and n-type (emitters) materials not only having excellent optoelectronic properties, but enjoying certain technological advantages with respect to those developed by other groups. Among these are absorbent-layer growth rates between 5 and 10 times as fast as conventional ones and microcrystalline emitters prepared without using hydrogen. The preparation of amorphous-silicon cells has required the solution of a number of problems, such as those related to pinholes, edge leak currents and diffusion of metals into the semiconductor. Once such constraints have been overcome, it has been demonstrated not only that the amorphous-silicon technology developed at CIEMAT is valid for making solar cells, but also that the quality of the semiconductor material is good for the application according to the partial results obtained. The development of thin-film laser-scribing technology is considered essential. Additionally it has been concluded that cross contamination, originated by the fact of using a single-chamber reactor, is the basic factor limiting the quality of the cells developed at CIEMAT. The present research activity is highly focused on the solution of this problem. (Author)23 refs

  5. Size effects on the thermal conductivity of amorphous silicon thin films

    Science.gov (United States)

    Braun, Jeffrey L.; Baker, Christopher H.; Giri, Ashutosh; Elahi, Mirza; Artyushkova, Kateryna; Beechem, Thomas E.; Norris, Pamela M.; Leseman, Zayd C.; Gaskins, John T.; Hopkins, Patrick E.

    2016-04-01

    We investigate thickness-limited size effects on the thermal conductivity of amorphous silicon thin films ranging from 3 to 1636 nm grown via sputter deposition. While exhibiting a constant value up to ˜100 nm, the thermal conductivity increases with film thickness thereafter. The thickness dependence we demonstrate is ascribed to boundary scattering of long wavelength vibrations and an interplay between the energy transfer associated with propagating modes (propagons) and nonpropagating modes (diffusons). A crossover from propagon to diffuson modes is deduced to occur at a frequency of ˜1.8 THz via simple analytical arguments. These results provide empirical evidence of size effects on the thermal conductivity of amorphous silicon and systematic experimental insight into the nature of vibrational thermal transport in amorphous solids.

  6. A preliminary investigation into hybrid photovoltaic cells with organic phthalocyanines and amorphous silicon heterojunction

    International Nuclear Information System (INIS)

    Hybrid photovoltaic cells take the advantages of silicon in charge carrier separation and transport and organic dyes in strong complementary light absorption. Photovoltaic responses from a set of hybrid solar cells based on amorphous silicon and phthalocyanine dyes of double- or triple-layer heterojunction structures were investigated, which were found to have thickness dependence with the organic active layers. It was found that the photocurrent contributions from organic layers are limited, although they are strong light absorbers. The main photocurrent contributions are from the silicon counterpart. (paper)

  7. Silicon MOS Pixel Based on the Deep Trapping Gate Principle: Design and Material Science Challenges

    CERN Document Server

    Fourches, Nicolas T

    2014-01-01

    The concept of the deep trapping gate device was introduced fairly recently on the basis of technological and transport simulations currently used in the field of classical electron devices. The concept of a buried gate containing localized deep level centers (Deep Trapping Gate or DTG) renders possible the operation of this field effect pixel detector. The deep centers can be deep defects or localized states in a quantum dot. This gate modulates the drain-source current. This principle was formerly evaluated with realistic simulations parameters and this shows that a measurable signal is obtained for an energy deposition of a minimum ionizing particle within a limited silicon thickness. We will study here the potential techniques usable for the fabrication of the device with their drawbacks, advantages and limits. The first technique introduced is impurity implantation, followed by annealing. The problems related to the control of the defects in the DTG will be examined in the light of recent work on ion imp...

  8. Study of Charge Diffusion in a Silicon Detector Using an Energy Sensitive Pixel Readout Chip

    CERN Document Server

    Schioppa, E. J.; van Beuzekom, M.; Visser, J.; Koffeman, E.; Heijne, E.; Engel, K. J.; Uher, J.

    2015-01-01

    A 300 μm thick thin p-on-n silicon sensor was connected to an energy sensitive pixel readout ASIC and exposed to a beam of highly energetic charged particles. By exploiting the spectral information and the fine segmentation of the detector, we were able to measure the evolution of the transverse profile of the charge carriers cloud in the sensor as a function of the drift distance from the point of generation. The result does not rely on model assumptions or electric field calculations. The data are also used to validate numerical simulations and to predict the detector spectral response to an X-ray fluorescence spectrum for applications in X-ray imaging.

  9. Breast cancer calcification measurements using direct X-ray detection in a monolithic silicon pixel detector

    International Nuclear Information System (INIS)

    A prototype monolithic silicon pixel detector, developed for high-precision tracking at the Superconducting Super Collider, has been used to measure, by direct detection of x-rays, aluminum oxide grains from an accreditation phantom, and calcifications from a tissue sample including a calcification with a width of 100 μm (about half the diameter of the smallest ones normally seen in clinical practice). A computer model indicates that a future sensor, using the same basic structure but optimized for mammography, has the potential of improving upon the abilities of scintillator-film and scintillator-CCD systems by observing individual x-rays, thus allowing the possibility of combining high resolution digital information from more than one viewing angle or x-ray energy

  10. Characterisation of micro-strip and pixel silicon detectors before and after hadron irradiation

    Science.gov (United States)

    Allport, P. P.; Ball, K.; Casse, G.; Chmill, V.; Forshaw, D.; Hadfield, K.; Pritchard, A.; Pool, P.; Tsurin, I.

    2012-01-01

    The use of segmented silicon detectors for tracking and vertexing in particle physics has grown substantially since their introduction in 1980. It is now anticipated that roughly 50,000 six inch wafers of high resistivity silicon will need to be processed into sensors to be deployed in the upgraded experiments in the future high luminosity LHC (HL-LHC) at CERN. These detectors will also face an extremely severe radiation environment, varying with distance from the interaction point. The volume of required sensors is large and their delivery is required during a relatively short time, demanding a high throughput from the chosen suppliers. The current situation internationally, in this highly specialist market, means that security of supply for large orders can therefore be an issue and bringing additional potential vendors into the field can only be an advantage. Semiconductor companies that could include planar sensors suitable for particle physics in their product lines will, however, need to prove their products meet all the stringent technical requirements. A semiconductor company with very widespread experience of producing science grade CCDs (including deep depletion devices) has adapted their CCD process to fabricate for the first time several wafers of pixel and micro-strip radiation hard sensors, suitable for future high energy physics experiments. The results of the pre-irradiation characterization of devices fabricated with different processing parameters and the measurements of charge collection properties after different hadron irradiation doses up to those anticipated for the (larger area) outer pixel layers at the high-luminosity LHC (HL-LHC) are presented and compared with results from more established particle physics suppliers.

  11. 3D silicon pixel detectors for the ATLAS Forward Physics experiment

    International Nuclear Information System (INIS)

    The ATLAS Forward Physics (AFP) project plans to install 3D silicon pixel detectors about 210 m away from the interaction point and very close to the beamline (2–3 mm). This implies the need of slim edges of about 100–200 μm width for the sensor side facing the beam to minimise the dead area. Another challenge is an expected non-uniform irradiation of the pixel sensors. It is studied if these requirements can be met using slightly-modified FE-I4 3D pixel sensors from the ATLAS Insertable B-Layer production. AFP-compatible slim edges are obtained with a simple diamond-saw cut. Electrical characterisations and beam tests are carried out and no detrimental impact on the leakage current and hit efficiency is observed. For devices without a 3D guard ring a remaining insensitive edge of less than 15 μm width is found. Moreover, 3D detectors are non-uniformly irradiated up to fluences of several 1015 neq/cm2 with either a focussed 23 GeV proton beam or a 23 MeV proton beam through holes in Al masks. The efficiency in the irradiated region is found to be similar to the one in the non-irradiated region and exceeds 97% in case of favourable chip-parameter settings. Only in a narrow transition area at the edge of the hole in the Al mask, a significantly lower efficiency is seen. A follow-up study of this effect using arrays of small pad diodes for position-resolved dosimetry via the leakage current is carried out

  12. Crystalline-Amorphous Core−Shell Silicon Nanowires for High Capacity and High Current Battery Electrodes

    KAUST Repository

    Cui, Li-Feng

    2009-01-14

    Silicon is an attractive alloy-type anode material for lithium ion batteries because of its highest known capacity (4200 mAh/g). However silicon\\'s large volume change upon lithium insertion and extraction, which causes pulverization and capacity fading, has limited its applications. Designing nanoscale hierarchical structures is a novel approach to address the issues associated with the large volume changes. In this letter, we introduce a core-shell design of silicon nanowires for highpower and long-life lithium battery electrodes. Silicon crystalline- amorphous core-shell nanowires were grown directly on stainless steel current collectors by a simple one-step synthesis. Amorphous Si shells instead of crystalline Si cores can be selected to be electrochemically active due to the difference of their lithiation potentials. Therefore, crystalline Si cores function as a stable mechanical support and an efficient electrical conducting pathway while amorphous shells store Li ions. We demonstrate here that these core-shell nanowires have high charge storage capacity (̃1000 mAh/g, 3 times of carbon) with ̃90% capacity retention over 100 cycles. They also show excellent electrochemical performance at high rate charging and discharging (6.8 A/g, ̃20 times of carbon at 1 h rate). © 2009 American Chemical Society.

  13. Defects study of hydrogenated amorphous silicon samples and their relation with the substrate and deposition conditions

    International Nuclear Information System (INIS)

    The goal of this work is to study the properties of the defects aiming to explore the types of defects and the effect of various deposition parameters such as substrate temperature, the kind of the substrate, gas pressure and deposition rate. Two kinds of samples have been used; The first one was a series of Schottky diodes, and the second one a series of solar cells (p-i-n junction) deposited on crystalline silicon or on corning glass substrates with different deposition parameters. The deposition parameters were chosen to obtain materials whose their structures varying from amorphous to microcrystalline silicon including polymorphous silicon. Our results show that the polymorphous silicon samples deposited at high deposition rates present the best photovoltaic properties in comparison with those deposited at low rates. Also we found that the defects concentration in high deposition rate samples is less at least by two orders than that obtained in low deposition rate polymorphous, microcrystalline and amorphous samples. This study shows also that there is no effect of the substrate, or the thin films of highly doped amorphous silicon deposited on the substrate, on the creation and properties of these defects. Finally, different experimental methods have been used; a comparison between their results has been presented. (author)

  14. Amorphous Silicon Carbide Passivating Layers to Enable Higher Processing Temperature in Crystalline Silicon Heterojunction Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu [Arizona State Univ., Mesa, AZ (United States); Holman, Zachary [Arizona State Univ., Mesa, AZ (United States)

    2015-04-06

    "Very efficient crystalline silicon (c-Si) solar cells have been demonstrated when thin layers of intrinsic and doped hydrogenated amorphous silicon (a-Si:H) are used for passivation and carrier selectivity in a heterojunction device. One limitation of this device structure is the (parasitic) absorption in the front passivation/collection a-Si:H layers; another is the degradation of the a-Si:H-based passivation upon temperature, limiting the post-processes to approximately 200°C thus restricting the contacting possibilities and potential tandem device fabrication. To alleviate these two limitations, we explore the potential of amorphous silicon carbide (a-SiC:H), a widely studied material in use in standard a-Si:H thin-film solar cells, which is known for its wider bandgap, increased hydrogen content and stronger hydrogen bonding compared to a-Si:H. We study the surface passivation of solar-grade textured n-type c-Si wafers for symmetrical stacks of 10-nm-thick intrinsic a-SiC:H with various carbon content followed by either p-doped or n-doped a-Si:H (referred to as i/p or i/n stacks). For both doping types, passivation (assessed through carrier lifetime measurements) is degraded by increasing the carbon content in the intrinsic a-SiC:H layer. Yet, this hierarchy is reversed after annealing at 350°C or more due to drastic passivation improvements upon annealing when an a-SiC:H layer is used. After annealing at 350°C, lifetimes of 0.4 ms and 2.0 ms are reported for i/p and i/n stacks, respectively, when using an intrinsic a-SiC:H layer with approximately 10% of carbon (initial lifetimes of 0.3 ms and 0.1 ms, respectively, corresponding to a 30% and 20-fold increase, respectively). For stacks of pure a-Si:H material the lifetimes degrade from 1.2 ms and 2.0 ms for i/p and i/n stacks, respectively, to less than 0.1 ms and 1.1 ms (12-fold and 2-fold decrease, respectively). For complete solar cells using pure a-Si:H i/p and i/n stacks, the open-circuit voltage (Voc

  15. Direct observations of thermally induced structural changes in amorphous silicon carbide

    International Nuclear Information System (INIS)

    Thermally induced structural relaxation in amorphous silicon carbide (SiC) has been examined by means of in situ transmission electron microscopy (TEM). The amorphous SiC was prepared by high-energy ion beam irradiation into a single crystalline 4H-SiC substrate. Cross-sectional TEM observations and electron energy-loss spectroscopy measurements revealed that thermal annealing induces a remarkable volume reduction, so-called densification, of amorphous SiC. From radial distribution function analyses using electron diffraction, notable changes associated with structural relaxation were observed in chemical short-range order. It was confirmed that the structural changes observed by the in situ TEM study agree qualitatively with those of the bulk material. On the basis of the alteration of chemical short-range order, we discuss the origin of thermally induced densification in amorphous SiC

  16. Low-temperature crystallization of amorphous silicon and amorphous germanium by soft X-ray irradiation

    International Nuclear Information System (INIS)

    The low-temperature-crystallization effects of soft X-ray irradiation on the structural properties of amorphous Si and amorphous Ge films were investigated. From the differences in crystallization between Si and Ge, it was found that the effects of soft X-ray irradiation on the crystallization strongly depended on the energy band gap and energy level. The crystallization temperatures of the amorphous Si and amorphous Ge films decreased from 953 K to 853 K and 773 K to 663 K, respectively. The decrease in crystallization temperature was also related to atoms transitioning into a quasi-nucleic phase in the films. The ratio of electron excitation and migration effects to thermal effects was controlled using the storage-ring current (photon flux density). Therefore, we believe that low-temperature crystallization can be realized by controlling atomic migration through electron excitation. - Highlights: • This work investigates the crystallization mechanism for soft X-ray irradiation. • The soft X-ray crystallization depended on the energy band gap and energy level. • The decrease in the crystallization temperature for Si and Ge films was 100 K. • This decrement was related to atoms transitioning into a quasi-nucleic phase

  17. Investigating the Inverse Square Law with the Timepix Hybrid Silicon Pixel Detector: A CERN [at] School Demonstration Experiment

    Science.gov (United States)

    Whyntie, T.; Parker, B.

    2013-01-01

    The Timepix hybrid silicon pixel detector has been used to investigate the inverse square law of radiation from a point source as a demonstration of the CERN [at] school detector kit capabilities. The experiment described uses a Timepix detector to detect the gamma rays emitted by an [superscript 241]Am radioactive source at a number of different…

  18. Molecular dynamics studies of the bonding properties of amorphous silicon nitride coatings on crystalline silicon

    OpenAIRE

    Butler, K.T.; Lamers, M.P.W.E.; Weeber, A. W.; Harding, J. H.

    2011-01-01

    In this paper we present molecular dynamics simulations of silicon nitride, both in bulk and as an interface to crystalline silicon. We investigate, in particular, the bonding structure of the silicon nitride and analyze the simulations to search for de- fective geometries which have been identified as potential charge carrier traps when silicon nitride forms an interface with silicon semiconductors. The simulations reveal how the bonding patterns in silicon nitride are dependent upon the sto...

  19. New technological method of forming an ohmic contact to undoped amorphous silicon hydride semiconductors

    International Nuclear Information System (INIS)

    Full text: The forming of surface ohmic contacts in thin film field transistors memory and solar cells on Schottky-type barrier and others on base amorphous hydrogenase silicon (a-Si:H) is rather laborious and not prime problem, as known. For example, typical ohmic contact layer materials sometimes exhibit diffusion through the amorphous silicon hydride layer resulting in ill-defined or dimensionally irregular contact and semiconductor regions and, in the extreme case, catastrophic degradation of the semiconductor properties of the material. Further, an oxide barrier may form at the interface, which limits electrical conductivity. Finally, in the prior art, in order to achieve ohmic contacts, it was required that a highly doped (n+- layer) film be deposited on the substrate before or after the amorphous silicon hydride deposition in order to reduce barrier formation at the metal-semiconductor interface. The dopant from gas phase contained gas phosphine for making n+- layer, but phosphine are toxic and explosive gas. This specified problem possible to solve entering in technological process of the creation thin-film device on a-Si:H (and other amorphous hydrogenase semiconductors) additional technological operation annealing the films of the amorphous semiconductor at a temperature of about 400 deg C (hydrogen effusion temperature), during 20-30 min, after the films of the semiconductor on substrate, if and when there is no need to forming the n-type layer. After cooling, an amorphous silicon hydride semiconductor layer covered with the masking dielectric layer, then the optical lithography for opening the windows in masking dielectric layer and evaporation metallic electrode are performed. The concerned method is based on the following known fact. The diffusion process (the evaporation) of the hydrogen occurs from surfaces of a-Si:H film at the temperature 350-450 deg. C. As a result this, concentration of the hydrogen a-Si:H surface layer are sharply decreased

  20. Amorphous silicon carbide heterojunction solar cells on p-type substrates

    International Nuclear Information System (INIS)

    The performance of silicon heterojunction (SHJ) solar cells is discussed in this paper in regard to their dependence on the applied amorphous silicon layers, their thicknesses and surface morphology. The emitter system investigated in this work consists of an n-doped, hydrogenized, amorphous silicon carbide a-SiC:H(n) layer with or without a pure, hydrogenized, intrinsic, amorphous silicon a-Si:H(i) intermediate layer. All solar cells were fabricated on p-type FZ-silicon and feature a high-efficiency backside consisting of a SiO2 passivation layer and a diffused local boron back surface field, allowing us to focus only on the effects of the front side emitter system. The highest solar cell efficiency achieved within this work is 18.5%, which is one of the highest values for SHJ-solar cells using p-type substrates. A dependence of the passivation quality on the surface morphology was only observed for solar cells including an a-Si:H(i) layer. It could be shown that the fill factor suffers from a reduction due to a reduced pseudo fill factor for emitter thicknesses below 11 nm due to a lower passivation quality and/or a higher potential for shunting thorough the a-Si emitter to the crystalline wafer with the conductive indium tin oxide layer. Furthermore, the influence of a variation of the doping gas flow (PH3) during the plasma enhanced chemical vapor deposition of the doped amorphous silicon carbide a-SiC:H(n) on the solar cell current-voltage characteristic-parameter has been investigated. We could demonstrate that a-SiC:H(n) shows in principle the same dependence on PH3-flow as pure a-Si:H(n).

  1. Dangling bond electron spin-lattice relaxation in rf-sputtered hydrogenated amorphous silicon and silicon carbide

    International Nuclear Information System (INIS)

    Electron spin resonance methods have been used to measure the temperature dependence of the spin-lattice relaxation time T1 of dangling bond electrons in hydrogenated amorphous silicon and silicon carbide samples prepared by radio frequency sputtering. The T1 measurements were made by a combination of continuous-wave absorption mode saturation and periodic adiabatic passage methods over the temperature range 100--400 K, yielding T/sup -1/1proportionalT2 behavior consistent with relaxation by two-level systems

  2. Amorphous silicon materials and solar cells - Progress and directions

    Science.gov (United States)

    Sabisky, E.; Mahan, H.; McMahon, T.

    In 1978, the U.S. Department of Energy initiated government sponsored research in amorphous materials and thin film solar cells. The program was subsequently transferred to the Solar Energy Research Institute for program management. The program grew into a major program for the development of high efficiency (greater than 10 percent), cost effective (15-40 cents per peak watt) thin film amorphous solar cells. The present international interest, the substantial progress made in the device area (2 percent PIN cell in 1976 to 10 percent PIN cell in 1982), and the marketing of the first consumer products using thin film solar cells are to a large ducts using thin film solar cells are to a large extent a consequence of this goal-oriented program.

  3. Nanoparticles embedded in hydrogenated amorphous silicon thin layers

    Czech Academy of Sciences Publication Activity Database

    Remeš, Zdeněk; Stuchlík, Jiří; Stuchlíková, The-Ha; Purkrt, Adam; Fajgar, Radek; Dřínek, Vladislav; Zhuravlev, K.; Galkin, N.G.

    Aachen : ICANS26, 2015 - (Carius, R.). s. 196-197 [International Conference on Amorphous and Nanocrystalline Semiconductors /26./ (ICANS26). 13.09.2015-18.09.2015, Aachen] R&D Projects: GA ČR(CZ) GA14-05053S; GA MŠk(CZ) LD14011; GA MŠk LH12236 Institutional support: RVO:68378271 ; RVO:67985858 Keywords : a-Si:H * LED * RLA * RDE Subject RIV: BM - Solid Matter Physics ; Magnetism

  4. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process

    International Nuclear Information System (INIS)

    A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx) interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface

  5. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process

    Science.gov (United States)

    Nagase, Takeshi; Yamashita, Ryo; Yabuuchi, Atsushi; Lee, Jung-Goo

    2015-11-01

    A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx) interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface.

  6. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx interface through electron irradiation - electronic excitation process

    Directory of Open Access Journals (Sweden)

    Takeshi Nagase

    2015-11-01

    Full Text Available A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface.

  7. A Comparison of Photo-Induced Hysteresis Between Hydrogenated Amorphous Silicon and Amorphous IGZO Thin-Film Transistors.

    Science.gov (United States)

    Ha, Tae-Jun; Cho, Won-Ju; Chung, Hong-Bay; Koo, Sang-Mo

    2015-09-01

    We investigate photo-induced instability in thin-film transistors (TFTs) consisting of amorphous indium-gallium-zinc-oxide (a-IGZO) as active semiconducting layers by comparing with hydrogenated amorphous silicon (a-Si:H). An a-IGZO TFT exhibits a large hysteresis window in the illuminated measuring condition but no hysteresis window in the dark condition. On the contrary, a large hysteresis window measured in the dark condition in a-Si:H was not observed in the illuminated condition. Even though such materials possess the structure of amorphous phase, optical responses or photo instability in TFTs looks different from each other. Photo-induced hysteresis results from initially trapped charges at the interface between semiconductor and dielectric films or in the gate dielectric which possess absorption energy to interact with deep trap-states and affect the movement of Fermi energy level. In order to support our claim, we also perform CV characteristics in photo-induced hysteresis and demonstrate thermal-activated hysteresis. We believe that this work can provide important information to understand different material systems for optical engineering which includes charge transport and band transition. PMID:26716230

  8. Reactive Infiltration of Silicon Melt Through Microporous Amorphous Carbon Preforms

    Science.gov (United States)

    Sangsuwan, P.; Tewari, S. N.; Gatica, J. E.; Singh, M.; Dickerson, R.

    1999-01-01

    The kinetics of unidirectional capillary infiltration of silicon melt into microporous carbon preforms have been investigated as a function of the pore morphology and melt temperature. The infiltrated specimens showed alternating bands of dark and bright regions, which corresponded to the unreacted free carbon and free silicon regions, respectively. The decrease in the infiltration front velocity for increasing infiltration distances, is in qualitative agreement with the closed-form solution of capillarity driven fluid flow through constant cross section cylindrical pores. However, drastic changes in the thermal response and infiltration front morphologies were observed for minute differences in the preforms microstructure. This suggests the need for a dynamic percolation model that would account for the exothermic nature of the silicon-carbon chemical reaction and the associated pore closing phenomenon.

  9. An investigation of dose and beam profile dosimetry with an amorphous silicon epid

    International Nuclear Information System (INIS)

    Full text: There is much current interest in the use of electronic portal imaging devices (EPIDs) for dosimetric applications such as accelerator quality assurance, in-vivo dosimetry, and verification of IMRT. However, the use of EPID for these purposes requires that the images can be used to obtain accurate dose measurements. The aim of this work is to investigate the accuracy and reproducibility of dose and beam profile measurements with an amorphous silicon EPID. The Varian aS500 detector produces a 'frame-averaged' image that is the image pixel values are the average of all acquired frames. By averaging frames throughout the delivery and then multiplying the result by the number of frames, an integrated pixel value can be obtained. The reproducibility of EPID response to the same incident dose was assessed by weekly measurement of the mean value of a 9x9 pixel region at the central axis, for a 100 monitor unit irradiation of a 10x10 cm field under the same set-up conditions. At each session, three images were acquired. The EPID dose response was obtained by multiplying the pixel value by the number of acquired frames. Images were acquired for both 6 MV and 18 MV at 105 cm to the EPID detector surface with 4 cm added solid water build-up. The linearity of the EPID response with linear change in dose was measured. Images were acquired for MLJ settings of 5, 10, 25, 50, 100, 200 and 300 MU for both 6 and 18 MV. Three images were acquired for each MU setting and the pixel values multiplied by the number of frames acquired. The reproducibility of open field profiles measured with the EPID with dose (MU) settings of 20, 50, 100, 200 and 300 MU was investigated. Additional solid water build-up of 0.5 cm and 2 cm was used for 6 and 18 MV to give dmax build-up. The field size was 30x30 cm. Open field profiles were compared to water-tank measurements with and without flood-field corrections to the EPID image. A correction image was developed to convert EPlD profiles to

  10. Microstructural tuning of polycrystalline silicon films from hydrogen diluted amorphous silicon films by AIC

    Energy Technology Data Exchange (ETDEWEB)

    Prathap, P.; Tuzun, O.; Roques, S.; Schmitt, S.; Slaoui, A. [InESS, CNRS-UdS, Strasbourg Cedex-2 (France); Maurice, C. [SMS Centre, UMR CNRS 5146, Ecole des Mines de Saint Etienne, 158 Cours Fauriel, 42023 Saint Etienne Cedex 2 (France)

    2011-03-15

    In the present study, the effect of hydrogen dilution in amorphous silicon on its crystallization kinetics and defect distribution using AIC has been studied. The a -Si films were deposited at different ratios of H{sub 2}/(H{sub 2}+SiH{sub 4}) using plasma enhanced chemical vapour deposition (ECR-PECVD) on glass-ceramic substrates. The thicknesses of aluminium and a -Si:H films were 0.20 {mu}m and 0. 37 {mu}m, respectively. The bi-layer structures were annealed in a tube furnace at 475 C for 8 hours in a nitrogen atmosphere. The results indicated that as the hydrogen dilution for a -Si:H films increased from 0% to 85%, the AIC grown poly-Si films were more stressed compressively, while the Raman peak broadened from 6.7 cm{sup -1} to 8.6 cm{sup -1}. It was found that the initiation of crystallization temperature as well as microstructure of poly-Si films was dramatically influenced by the hydrogen content in precursor a -Si films. The distribution of microstructural defects analysed by Electron Back Scattering Diffraction (EBSD) method indicated that frequency of low angle grain boundaries (LAGB) were more at higher hydrogen dilution ratios while coincident site lattice boundaries (CSL) of first order ({sigma}3), second order ({sigma}9) and third order ({sigma}27) were less sensitive to the hydrogen dilutions/content (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  11. Characterization of 13 and 30 $\\mu$m thick hydrogenated amorphous silicon diodes deposited over CMOS integrated circuits for particle detection application

    CERN Document Server

    Despeisse, M; Commichau, S C; Dissertori, G; Garrigos, A; Jarron, P; Miazza, C; Moraes, D; Shah, A; Viertel, G; Wyrsch, N; 10.1016/j.nima.2003.11.022

    2004-01-01

    We present the experimental results obtained with a novel monolithic silicon pixel detector which consists in depositing an n-i-p hydrogenated amorphous silicon (a-Si:H) diode straight above the readout ASIC (this technology is called thin film on ASIC, TFA). The characterization has been performed on 13 and 30 mu m thick a-Si:H films deposited on top of an ASIC containing a linear array of high- speed low-noise transimpedance amplifiers designed in a 0.25 mu m CMOS technology. Experimental results presented have been obtained with a 600 nm pulsed laser. The results of charge collection efficiency and charge collection speed of these structures are discussed.

  12. AuPd CATALYTIC NANOPARTICLE SIZE EFFECT ON THE FORMATION OF AMORPHOUS SILICON NANOWIRES

    Institute of Scientific and Technical Information of China (English)

    LIU ZU-QIN; SUN LIAN-FENG; TANG DONG-SHENG; ZHOU WEI-YA; LI YU-BAO; Zou XIAO-PING

    2000-01-01

    Amorphous silicon (a-Si) nanowires have been prepared on SiO2/Si substrates by AuPd nanoparticles / silane reaction method. Field-emission scanning electron microscopy and transmission electron microscopy were used to characterize the samples. The typical a-Si nanowires we obtained are of a uniform diameter about 20 nm and length up to several micrometers. The growth mechanism of the nanowires seems to be the vapor-liquid-solid mechanism. The catalytic particle size effect on the formation of the nanowires and the cause of forming amorphous state Si nanowires are discussed.

  13. Dielectric relaxation and hydrogen diffusion in amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Phillips, J.C. (AT and T Bell Labs., Murray Hill, NJ (United States))

    1994-04-01

    Hydrogen diffusion is technologically critical to the processing of amorphous Si for solar cell applications. It is shown that this diffusion belongs to a broad class of dielectric relaxation mechanisms which were first studied by Kohlrausch in 1847. A microscopic theory of the Kohlrausch relaxation constant [beta][sub K] is also constructed. This theory explains the values of [beta] observed in many electronic, molecular and polymeric relaxation processes. It is based on two novel concepts: Wiener sausages, from statistical mechanics, and the magic wand, from axiomatic set theory

  14. Evidence of chemical ordering in amorphous hydrogenated silicon carbide

    International Nuclear Information System (INIS)

    Amorphous Si/sub 0.68/C/sub 0.32/:H prepared by radio frequency glow discharge from a mixture of methane and silane was studied by means of the complementary techniques of electron energy-loss spectroscopy and electron diffraction. The experimental results are consistent with Si and C forming a tetrahedral network with nearest neighbor distances similar to those in crystalline Si and crystalline SiC. There is evidence that the C atoms tend to be surrounded by four Si atoms rather than a random distribution of C and Si on the tetrahedral network

  15. Silicon nitride and intrinsic amorphous silicon double antireflection coatings for thin-film solar cells on foreign substrates

    International Nuclear Information System (INIS)

    Hydrogenated intrinsic amorphous silicon (a-Si:H) was investigated as a surface passivation method for crystalline silicon thin film solar cells on graphite substrates. The results of the experiments, including quantum efficiency and current density-voltage measurements, show improvements in cell performance. This improvement is due to surface passivation by an a-Si:H(i) layer, which increases the open circuit voltage and the fill factor. In comparison with our previous work, we have achieved an increase of 0.6% absolute cell efficiency for a 40 μm thick 4 cm2 aperture area on the graphite substrate. The optical properties of the SiNx/a-Si:H(i) stack were studied using spectroscopic ellipsometer techniques. Scanning transmission electron microscopy inside a scanning electron microscope was applied to characterize the cross section of the SiNx/a-Si:H(i) stack using focus ion beam preparation. - Highlights: • We report a 10.8% efficiency for thin-film silicon solar cell on graphite. • Hydrogenated intrinsic amorphous silicon was applied for surface passivation. • SiNx/a-Si:H(i) stacks were characterized by spectroscopic ellipsometer techniques. • Cross-section micrograph was obtained by scanning transmission electron microscopy. • Quantum efficiency and J-V measurements show improvements in the cell performance

  16. Silicon nitride and intrinsic amorphous silicon double antireflection coatings for thin-film solar cells on foreign substrates

    Energy Technology Data Exchange (ETDEWEB)

    Li, Da; Kunz, Thomas [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Wolf, Nadine [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Energy Efficiency, Am Galgenberg 87, 97074 Wuerzburg (Germany); Liebig, Jan Philipp [Materials Science and Engineering, Institute I, University of Erlangen-Nuremberg, Martensstr. 5, 91058 Erlangen (Germany); Wittmann, Stephan; Ahmad, Taimoor; Hessmann, Maik T.; Auer, Richard [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Göken, Mathias [Materials Science and Engineering, Institute I, University of Erlangen-Nuremberg, Martensstr. 5, 91058 Erlangen (Germany); Brabec, Christoph J. [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Institute of Materials for Electronics and Energy Technology, University of Erlangen-Nuremberg, Martensstr. 7, 91058 Erlangen (Germany)

    2015-05-29

    Hydrogenated intrinsic amorphous silicon (a-Si:H) was investigated as a surface passivation method for crystalline silicon thin film solar cells on graphite substrates. The results of the experiments, including quantum efficiency and current density-voltage measurements, show improvements in cell performance. This improvement is due to surface passivation by an a-Si:H(i) layer, which increases the open circuit voltage and the fill factor. In comparison with our previous work, we have achieved an increase of 0.6% absolute cell efficiency for a 40 μm thick 4 cm{sup 2} aperture area on the graphite substrate. The optical properties of the SiN{sub x}/a-Si:H(i) stack were studied using spectroscopic ellipsometer techniques. Scanning transmission electron microscopy inside a scanning electron microscope was applied to characterize the cross section of the SiN{sub x}/a-Si:H(i) stack using focus ion beam preparation. - Highlights: • We report a 10.8% efficiency for thin-film silicon solar cell on graphite. • Hydrogenated intrinsic amorphous silicon was applied for surface passivation. • SiN{sub x}/a-Si:H(i) stacks were characterized by spectroscopic ellipsometer techniques. • Cross-section micrograph was obtained by scanning transmission electron microscopy. • Quantum efficiency and J-V measurements show improvements in the cell performance.

  17. Band offsets between amorphous La2Hf2O7 and silicon

    Institute of Scientific and Technical Information of China (English)

    CHENG Xuerui; WANG Yongqiang; QI Zeming; ZHANG Guobin; WANG Yuyin; SHAO Tao; ZHANG Wenhua

    2012-01-01

    Amorphous La2Hf2O7 films were grown on Si(100) by pulsed laser deposition method.The valence and conduction band offsets between amorphous La2Hf2O7 film and silicon were determined by using synchrotron radiation photoemission spectroscopy.The energy band gap of amorphous La2Hf2O7 film was measured from the energy-loss spectra of O 1s photoelectrons.The band gap of amorphous La2Hf2O7 film was determined to be 5.4±0.2 eV.The valence and the conduction-band offsets of amorphous La2Hf2O7 film to Si were obtained to be 2.7±0.2 and 1.6±0.2 eV,respectively.These results indicated that the amorphous La2Hf2O7 film could be one promising candidate for high-k gate dielectrics.

  18. Spatially localized current-induced crystallization of amorphous silicon films

    Czech Academy of Sciences Publication Activity Database

    Rezek, Bohuslav; Šípek, Emil; Ledinský, Martin; Krejza, P.; Stuchlík, Jiří; Fejfar, Antonín; Kočka, Jan

    2008-01-01

    Roč. 354, 19-25 (2008), s. 2305-2309. ISSN 0022-3093 R&D Projects: GA MŠk(CZ) LC06040; GA AV ČR KAN400100701; GA MŠk LC510 Institutional research plan: CEZ:AV0Z10100521 Keywords : silicon * crystallization * atomic force and scanning tunneling microscopy * nanocrystals Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.449, year: 2008

  19. Enhanced Multiple Exciton Generation in Amorphous Silicon Nanoparticles

    OpenAIRE

    Kryjevski, Andrei; Kilin, Dmitri

    2014-01-01

    Multiple exciton generation (MEG) in nanometer-sized hydrogen-passivated silicon nanowires (NWs), and quasi two-dimensional nanofilms strongly depends on the degree of the core structural disorder as shown by the many-body perturbation theory (MBPT) calculations based on the density functional theory (DFT) simulations. Working to the second order in the electron-photon coupling and in the screened Coulomb interaction we calculate quantum efficiency (QE), the average number of excitons created...

  20. Directional detection of fast neutrons by the Timepix pixel detector coupled to plastic scintillator with silicon photomultiplier array

    International Nuclear Information System (INIS)

    Fast neutrons are conventionally detected by scintillators of large volume, low spatial resolution and poor, if any, directional sensitivity. In this paper we present a detection technique based on the tracking of protons recoiled by fast neutrons. In this approach we use the silicon pixel detector Timepix attached in contact planar geometry to a fast plastic scintillator. The protons recoiled by neutrons in the scintillator are detected by the pixel detector while scintillation light is sensed by a 4 × 4 array of silicon photomultipliers (SiPM). Each photomultiplier is equipped with an independent amplifier and discriminator providing a fast trigger signal to the pixel detector. Variable threshold level allows adjustment of the trigger sensitivity. Single events in the pixel detector can be tagged and triggered by the scintillating detector. Position and energy sensitivity of the scintillator together with the position and the energy sensitivity of the pixel detector allow obtaining information about the position and the spectrum of the neutron source. The Timepix detector is operated with the FITPix readout interface and the Pixelman software package providing control, DAQ and online visualization. The assembled prototype has been tested with fast neutrons from a laboratory radioactive source (AmBe) and a Van de Graaff accelerator (D-T reaction). The detector architecture, comprising the Timepix device, the scintillator and the segmented SiPM, allows stacking several such units for increased detection efficiency and enhanced directional sensitivity.

  1. In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy

    CERN Document Server

    Kessels, W M M; Sanden, M C M; Aydil, E S

    2002-01-01

    An in situ method based on attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR) is presented for detecting surface silicon hydrides on plasma deposited hydrogenated amorphous silicon (a-Si:H) films and for determining their surface concentrations. Surface silicon hydrides are desorbed by exposing the a-Si:H films to low energy ions from a low density Ar plasma and by comparing the infrared spectrum before and after this low energy ion bombardment, the absorptions by surface hydrides can sensitively be separated from absorptions by bulk hydrides incorporated into the film. An experimental comparison with other methods that utilize isotope exchange of the surface hydrogen with deuterium showed good agreement and the advantages and disadvantages of the different methods are discussed. Furthermore, the determination of the composition of the surface hydrogen bondings on the basis of the literature data on hydrogenated crystalline silicon surfaces is presented, and quantification of the h...

  2. Innovative Characterization of Amorphous and Thin-Film Silicon for Improved Module Performance: 1 February 2005 - 31 July 2008

    Energy Technology Data Exchange (ETDEWEB)

    Taylor, P. C.; Williams, G. A.

    2009-09-01

    Electron spin resonance and nuclear magnetic resonance was done on amorphous silicon samples (modules with a-Si:H and a-SixGe1-x:H intrinsic layer) to study defects that contribute to Staebler-Wronski effect.

  3. Plasma-initiated rehydrogenation of amorphous silicon to increase the temperature processing window of silicon heterojunction solar cells

    Science.gov (United States)

    Shi, Jianwei; Boccard, Mathieu; Holman, Zachary

    2016-07-01

    The dehydrogenation of intrinsic hydrogenated amorphous silicon (a-Si:H) at temperatures above approximately 300 °C degrades its ability to passivate silicon wafer surfaces. This limits the temperature of post-passivation processing steps during the fabrication of advanced silicon heterojunction or silicon-based tandem solar cells. We demonstrate that a hydrogen plasma can rehydrogenate intrinsic a-Si:H passivation layers that have been dehydrogenated by annealing. The hydrogen plasma treatment fully restores the effective carrier lifetime to several milliseconds in textured crystalline silicon wafers coated with 8-nm-thick intrinsic a-Si:H layers after annealing at temperatures of up to 450 °C. Plasma-initiated rehydrogenation also translates to complete solar cells: A silicon heterojunction solar cell subjected to annealing at 450 °C (following intrinsic a-Si:H deposition) had an open-circuit voltage of less than 600 mV, but an identical cell that received hydrogen plasma treatment reached a voltage of over 710 mV and an efficiency of over 19%.

  4. Results from a hybrid silicon pixel telescope tested in a heavy ion experiment at the Cern Omega Spectrometer

    International Nuclear Information System (INIS)

    A telescope made of three OMEGA-ION hybrid silicon pixel detectors has been successfully tested in the heavy ion experiment WA94. Each plane consisted of a single detector with 1006 active pixels (500 μm x 75 μm), each one being bump-bonded to the read-out chip, and arranged in 16 columns and 63 rows respectively. With a sensitive area as small as 8000x4725 μm2 several million events with at least one track originating from sulphur-sulphur interactions have been recorded in a few hours. Results on target reconstruction, tracking accuracy and efficiency are presented. (orig.)

  5. Preparation and Surface Analysis of a Fluorinated Amorphous Silicon for Photo-voltaic Device Application

    Science.gov (United States)

    McWhinney, Hylton G.; Burton, Dawn; Fogarty, Thomas N.

    1998-01-01

    Amorphous silicon films (a-Si:H) have been routinely deposited on a variety of substrates. Surface and interfacial studies were carried out with a PHI 5600 X-ray photo electron spectrometer. Co-deposition with fluorine yielded films having oxygen present as bulk oxide. The higher the fluorine content, the greater the amount of bulk oxygen observed. The presence of oxygen may be a contributing factor to inconsistent film properties of fluorine doped silicon materials, reported else where. A definite chemical interface between a layer containing fluorine and a layer made from pure silane has been delineated.

  6. Picosecond all-optical switching in hydrogenated amorphous silicon microring resonators

    CERN Document Server

    Pelc, Jason S; Vo, Sonny; Santori, Charles; Fattal, David A; Beausoleil, Raymond G

    2014-01-01

    We utilize cross-phase modulation to observe all-optical switching in microring resonators fabricated with hydrogenated amorphous silicon (a-Si:H). Using 2.7-ps pulses from a mode-locked fiber laser in the telecom C-band, we observe optical switching of a cw telecom-band probe with full-width at half-maximum switching times of 14.8 ps, using approximately 720 fJ of energy deposited in the microring. In comparison with telecom-band optical switching in crystalline silicon microrings, a-Si:H exhibits substantially higher switching speeds due to reduced impact of free-carrier processes.

  7. Highly efficient ultrathin-film amorphous silicon solar cells on top of imprinted periodic nanodot arrays

    Energy Technology Data Exchange (ETDEWEB)

    Yan, Wensheng, E-mail: yws118@gmail.com; Gu, Min, E-mail: mgu@swin.edu.au [Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, Victoria 3122 (Australia); Tao, Zhikuo [College of Electronic Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023 (China); Ong, Thiam Min Brian [Plasma Sources and Application Center, NIE, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616 (Singapore); Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602 (Singapore)

    2015-03-02

    The addressing of the light absorption and conversion efficiency is critical to the ultrathin-film hydrogenated amorphous silicon (a-Si:H) solar cells. We systematically investigate ultrathin a-Si:H solar cells with a 100 nm absorber on top of imprinted hexagonal nanodot arrays. Experimental evidences are demonstrated for not only notable silver nanodot arrays but also lower-cost ITO and Al:ZnO nanodot arrays. The measured external quantum efficiency is explained by the simulation results. The J{sub sc} values are 12.1, 13.0, and 14.3 mA/cm{sup 2} and efficiencies are 6.6%, 7.5%, and 8.3% for ITO, Al:ZnO, and silver nanodot arrays, respectively. Simulated optical absorption distribution shows high light trapping within amorphous silicon layer.

  8. Anomalous behavior of Gear's predictor-corrector algorithm in a molecular dynamics simulation of amorphous silicon

    International Nuclear Information System (INIS)

    An anomalous behavior of Gear's predictor-corrector algorithm is observed during a microcanonical molecular dynamics simulation of amorphous silicon. While the amorphous silicon network generated by quenching was being annealed, an anomaly is started: both the total energy and the temperature of the system spontaneously and indefinitely increased, in violation of energy conservation. No such phenomenon was observed when the integrator was switched to the Verlet algorithm. To remove this anomaly with the Gear's algorithm, it was necessary to reduce the size of the time step to 1/32 of the 'usual value (∼ 1/100 of the fastest vibration period in the system)' at least. Our results show that Gear's algorithm may become very unstable in a realistic simulation when the time step is not small enough, that is, orders of magnitude smaller than conventional value.

  9. Amorphous silicon research. Final technical report, 13 September 1994--28 February 1998

    Energy Technology Data Exchange (ETDEWEB)

    Arya, R.; Carlson, D.; Chen, L.; Ganguly, G.; He, M.; Lin, G.; Middya, R.; Skibo, S.; Wood, G. [Solarex, Newtown, PA (United States)

    1998-06-01

    The Solarex research and development program has focused for the last few years on developing a high-performance amorphous silicon tandem process and on scaling it up to large areas. Significant progress has been made in several areas: (1) improved understanding of the light-induced degradation of amorphous silicon alloys, (2) the processing time for tandem device structures has been reduced by 21%, (3) the feedstock gas utilization has been increased by 30%, (4) stabilized conversion efficiencies of more than 8% have been demonstrated in 4-ft{sup 2} tandem modules made in a pilot production mode, and (4) the tandem module process has been transferred to a Solarex manufacturing plant in Virginia that is capable of producing 10 MW of 8.6-ft{sup 2} tandem modules per year.

  10. Amorphous and 'micromorph' silicon tandem cells with high open-circuit voltage

    Energy Technology Data Exchange (ETDEWEB)

    Loeffler, J.; Gordijn, A.; Stolk, R.L.; Li, H.; Rath, J.K.; Schropp, R.E.I. [Utrecht University (Netherlands). Debye Inst.

    2005-05-01

    For amorphous and 'micromorph' silicon multi-junction solar cells, we have developed tunnel recombination junctions consisting of two microcrystalline doped layers with a defect-rich interface. While the solar cells performed reasonably well under AM 1.5 light, we found in spectral response measurements that the first deposited cell of tandem structures in nip and pin configuration was apparently leaking under low light conditions. Insertion of a thin protection layer of n-type amorphous silicon solved this issue, and led to an increase in open-circuit voltage. Voltages as high as 1.76 V have been obtained for a-Si/a-Si pinpin tandem cells. (author)

  11. Carbon nanotube-amorphous silicon hybrid solar cell with improved conversion efficiency

    Science.gov (United States)

    Funde, Adinath M.; Nasibulin, Albert G.; Gufran Syed, Hashmi; Anisimov, Anton S.; Tsapenko, Alexey; Lund, Peter; Santos, J. D.; Torres, I.; Gandía, J. J.; Cárabe, J.; Rozenberg, A. D.; Levitsky, Igor A.

    2016-05-01

    We report a hybrid solar cell based on single walled carbon nanotubes (SWNTs) interfaced with amorphous silicon (a-Si). The high quality carbon nanotube network was dry transferred onto intrinsic a-Si forming Schottky junction for metallic SWNT bundles and heterojunctions for semiconducting SWNT bundles. The nanotube chemical doping and a-Si surface treatment minimized the hysteresis effect in current-voltage characteristics allowing an increase in the conversion efficiency to 1.5% under an air mass 1.5 solar spectrum simulator. We demonstrated that the thin SWNT film is able to replace a simultaneously p-doped a-Si layer and transparent conductive electrode in conventional amorphous silicon thin film photovoltaics.

  12. Measurement of the quantum efficiency of CsI, amorphous silicon and organometallic reflective photocathodes

    Energy Technology Data Exchange (ETDEWEB)

    Malamud, G. (LPNHE, Ecole Polytechnique, IN2P3-CNRS, 91128 Palaiseau (France)); Mine, P. (LPNHE, Ecole Polytechnique, IN2P3-CNRS, 91128 Palaiseau (France)); Vartsky, D. (LPNHE, Ecole Polytechnique, IN2P3-CNRS, 91128 Palaiseau (France)); Equer, B. (PICM, Ecole Polytechnique, CNRS (UPR258), 91128 Palaiseau (France)); Besson, P. (CE Saclay, DAPNIA/SED, 91191 Gif-sur-Yvette Cedex (France)); Bourgeois, P. (CE Saclay, DAPNIA/SED, 91191 Gif-sur-Yvette Cedex (France)); Breskin, A. (LPNHE, Ecole Polytechnique, IN2P3-CNRS, 91128 Palaiseau (France)); Chechik, R. (The Weizmann Institute of Science, 76100 Rehovot (Israel))

    1994-09-01

    We performed a systematic investigation of the quantum efficiency of some solid reflective photocathodes in the spectral range 140-240 nm. The measurements were made without gaseous amplification in vacuum and in methane. No significant difference was found among CsI photocathodes prepared by vacuum deposition at different institutes, either from powders or from crystals of different origins, and measured either in vacuum or in methane. Amorphous silicon photocathodes were prepared by the plasma enhanced chemical vapor deposition technique. We present the results for several doping conditions of amorphous silicon and for p-n junctions. Some organometallic photocathodes, containing iron or other transition metals (cerium), were evaporated and measured. Among them decamethylferrocene exhibits the highest quantum efficiency in the range 190-240 nm. ((orig.))

  13. A fast method to diagnose phase transition from amorphous to microcrystalline silicon

    Institute of Scientific and Technical Information of China (English)

    HOU; GuoFu

    2007-01-01

    A series of hydrogenated silicon thin films were prepared by the radio frequency plasma enhanced chemical vapor deposition method (RF-PECVD) with various silane concentrations. The influence of silane concentration on structural and electrical characteristics of these films was investigated to study the phase transition region from amorphous to microcrystalline phase. At the same time, optical emission spectra (OES) from the plasma during the deposition process were monitored to get information about the plasma properties, Raman spectra were measured to study the structural characteristics of the deposited films. The combinatorial analysis of OES and Raman spectra results demonstrated that the OES can be used as a fast method to diagnose phase transition from amorphous to microcrystalline silicon. At last the physical mechanism, why both OES and Raman can be used to diagnose the phase transition, was analyzed theoretically.……

  14. Modeling the Crystallization of Amorphous Silicon Thin Films Using a High Repetition Rate Scanning Laser

    Directory of Open Access Journals (Sweden)

    R. Černý

    2000-01-01

    Full Text Available An optimum design of experimental setup for the preparation of polycrystalline silicon (pc-Si films from amorphous layers applicable in the solar cell production is analyzed in the paper. In the computational simulations, the influence of basic characteristic parameters of the experimental procedure on the mechanisms of pc-Si lateral growth is studied. Among these parameters, the energy density of the applied laser and the thickness of the amorphous silicon (a-Si layer are identified as the most significant. As an optimum solution, the mechanism of pc-Si growth consisting in repeated melting of a part of already crystallized pc-Si layer by the scanning laser is proposed.

  15. A fast method to diagnose phase transition from amorphous to microcrystalline silicon

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    @@ A series of hydrogenated silicon thin films were prepared by the radio frequency plasma enhanced chemical vapor deposition method (RF-PECVD) with various silane concentrations. The influence of silane concentration on structural and electrical characteristics of these films was investigated to study the phase transition region from amorphous to microcrystalline phase. At the same time, optical emission spectra (OES) from the plasma during the deposition process were monitored to get information about the plasma properties, Raman spectra were measured to study the structural characteristics of the deposited films. The combinatorial analysis of OES and Raman spectra results demonstrated that the OES can be used as a fast method to diagnose phase transition from amorphous to microcrystalline silicon. At last the physical mechanism, why both OES and Raman can be used to diagnose the phase transition, was analyzed theoretically.

  16. Low Cost Amorphous Silicon Intrinsic Layer for Thin-Film Tandem Solar Cells

    Directory of Open Access Journals (Sweden)

    Ching-In Wu

    2013-01-01

    Full Text Available The authors propose a methodology to improve both the deposition rate and SiH4 consumption during the deposition of the amorphous silicon intrinsic layer of the a-Si/μc-Si tandem solar cells prepared on Gen 5 glass substrate. It was found that the most important issue is to find out the saturation point of deposition rate which guarantees saturated utilization of the sourcing gas. It was also found that amorphous silicon intrinsic layers with the same k value will result in the same degradation of the fabricated modules. Furthermore, it was found that we could significantly reduce the production cost of the a-Si/μc-Si tandem solar cells prepared on Gen 5 glass substrate by fine-tuning the process parameters.

  17. Carbon nanotube-amorphous silicon hybrid solar cell with improved conversion efficiency.

    Science.gov (United States)

    Funde, Adinath M; Nasibulin, Albert G; Syed, Hashmi Gufran; Anisimov, Anton S; Tsapenko, Alexey; Lund, Peter; Santos, J D; Torres, I; Gandía, J J; Cárabe, J; Rozenberg, A D; Levitsky, Igor A

    2016-05-01

    We report a hybrid solar cell based on single walled carbon nanotubes (SWNTs) interfaced with amorphous silicon (a-Si). The high quality carbon nanotube network was dry transferred onto intrinsic a-Si forming Schottky junction for metallic SWNT bundles and heterojunctions for semiconducting SWNT bundles. The nanotube chemical doping and a-Si surface treatment minimized the hysteresis effect in current-voltage characteristics allowing an increase in the conversion efficiency to 1.5% under an air mass 1.5 solar spectrum simulator. We demonstrated that the thin SWNT film is able to replace a simultaneously p-doped a-Si layer and transparent conductive electrode in conventional amorphous silicon thin film photovoltaics. PMID:27005494

  18. A delta-doped amorphous silicon thin-film transistor with high mobility and stability

    International Nuclear Information System (INIS)

    Ultrathin doped layers, known as delta-doped layers, were introduced within the intrinsic amorphous silicon (a-Si) active layer to fabricate hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) with enhanced field-effect mobility. The performance of the delta-doped a-Si:H TFTs depended on the phosphine (PH3) flow rate and the distance from the n+ a-Si to the delta-doping layer. The delta-doped a-Si:H TFTs fabricated using a commercial manufacturing process exhibited an enhanced field-effect mobility of approximately ∼0.23 cm2/Vs (compared to a conventional a-Si:H TFT with 0.15 cm2/Vs) and a desirable stability under a bias-temperature stress test.

  19. Development of laser-fired contacts for amorphous silicon layers obtained by Hot-Wire CVD

    Energy Technology Data Exchange (ETDEWEB)

    Munoz, D. [XaRMAE-Universitat de Barcelona, Departament de Fisica Aplicada i Optica, Diagonal 647, Barcelona 08028 (Spain)], E-mail: delfina@eel.upc.edu; Voz, C.; Blanque, S. [Universitat Politecnica de Catalunya, Grup de Recerca en Micro i Nanotecnologies, Jordi Girona 1-3, Barcelona 08034 (Spain); Ibarz, D.; Bertomeu, J. [XaRMAE-Universitat de Barcelona, Departament de Fisica Aplicada i Optica, Diagonal 647, Barcelona 08028 (Spain); Alcubilla, R. [Universitat Politecnica de Catalunya, Grup de Recerca en Micro i Nanotecnologies, Jordi Girona 1-3, Barcelona 08034 (Spain)

    2009-03-15

    In this work we study aluminium laser-fired contacts for intrinsic amorphous silicon layers deposited by Hot-Wire CVD. This structure could be used as an alternative low temperature back contact for rear passivated heterojunction solar cells. An infrared Nd:YAG laser (1064 nm) has been used to locally fire the aluminium through the thin amorphous silicon layers. Under optimized laser firing parameters, very low specific contact resistances ({rho}{sub c} {approx} 10 m{omega} cm{sup 2}) have been obtained on 2.8 {omega} cm p-type c-Si wafers. This investigation focuses on maintaining the passivation quality of the interface without an excessive increase in the series resistance of the device.

  20. Highly efficient ultrathin-film amorphous silicon solar cells on top of imprinted periodic nanodot arrays

    International Nuclear Information System (INIS)

    The addressing of the light absorption and conversion efficiency is critical to the ultrathin-film hydrogenated amorphous silicon (a-Si:H) solar cells. We systematically investigate ultrathin a-Si:H solar cells with a 100 nm absorber on top of imprinted hexagonal nanodot arrays. Experimental evidences are demonstrated for not only notable silver nanodot arrays but also lower-cost ITO and Al:ZnO nanodot arrays. The measured external quantum efficiency is explained by the simulation results. The Jsc values are 12.1, 13.0, and 14.3 mA/cm2 and efficiencies are 6.6%, 7.5%, and 8.3% for ITO, Al:ZnO, and silver nanodot arrays, respectively. Simulated optical absorption distribution shows high light trapping within amorphous silicon layer

  1. Photodecomposition of Hg - Photo - CVD monosilane. Application to hydrogenated amorphous silicon thin films

    International Nuclear Information System (INIS)

    The construction of a Hg-photo-CVD device is discussed. The system enables the manufacturing of hydrogenous thin films of amorphous silicon from monosilane compound. The reaction mechanisms taking place in the gaseous phase and at the surface, and the optimal conditions for the amorphous silicon film growth are studied. The analysis technique is based on the measurement of the difference between the condensation points of the gaseous components of the mixture obtained from the monosilane photolysis. A kinetic simplified model is proposed. Conductivity measurements are performed and the heat treatment effects are analyzed. Trace amounts of oxygen and carbon are found in the material. No Hg traces are detected by SIMS analysis

  2. Optical Waveform Sampling of a 320 Gbit/s Serial Data Signal using a Hydrogenated Amorphous Silicon Waveguide

    DEFF Research Database (Denmark)

    Ji, Hua; Hu, Hao; Pu, Minhao;

    2011-01-01

    We propose using a hydrogenated amorphous silicon waveguide for ultra-high-speed serial data waveform sampling. 320 Gbit/s serial optical data sampling is experimentally demonstrated with +12 dB intrinsic four wave mixing conversion efficiency.......We propose using a hydrogenated amorphous silicon waveguide for ultra-high-speed serial data waveform sampling. 320 Gbit/s serial optical data sampling is experimentally demonstrated with +12 dB intrinsic four wave mixing conversion efficiency....

  3. Atomistic modeling of amorphous silicon carbide using a bond-order potential

    International Nuclear Information System (INIS)

    Molecular dynamics simulations were performed with a Brenner-type bond-order potential to study the melting of silicon carbide (SiC), the structure of amorphous SiC produced by quenching from the melt, and the evolution of the amorphous state after isochronal annealing at elevated temperatures. The simulations reveal that SiC melts above 3700 K with an enthalpy of fusion of about 0.6 eV/atom. The density of the quenched liquid is about 2820 kg/m3, in excellent agreement with the experimental value for SiC amorphized by neutron irradiation. In addition to the loss of long-range order, the quenched liquid shows short-range disorder as measured by the C homonuclear bond ratio. Upon annealing, there is partial recovery of short-range order

  4. Adopting a customer-focused team approach to amorphous silicon multijunction module R ampersand D

    International Nuclear Information System (INIS)

    Informed observers of energy markets now generally believe that photovoltaics (PV) will not significantly penetrate the utility bulk-power sector before price and performance approach $50/m2 for 15% efficient modules in flat-plate systems. Recent progress toward such ''utility grade'' modules using amorphous thin films has been slow. The important amorphous thin-film research issues have been well known for some years. These have not been promptly and conclusively addressed, at least in part, because of inadequate PV industry involvement in academic research. In view of this situation, the authors recently modified their research programs seeking to improve the efficiency of amorphous silicon PV research, conclusively address the key issues, and accelerate commercial introduction of utility-grade products. They began this by seeking ''customer'' (PV industry) specification of research priorities and forming mission-oriented teams to pursue the high-priority issues (customer requirements). This paper describes the process and results to date

  5. 2H-SiC Dendritic Nanocrystals In Situ Formation from Amorphous Silicon Carbide under Electron Beam Irradiation

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    Under electron beam irradiation, the in-situ formation of 2H-SiC dentritic nanocrystals from amorphous silicon carbide at room temperature was observed. The homogenous transition mainly occurs at the thin edge and on the surface of specimen where the energy obtained from electron beam irradiation is high enough to cause the amorphous crystallizing into 2H-SiC.

  6. Three-dimensional amorphous silicon solar cells on periodically ordered ZnO nanocolumns

    Czech Academy of Sciences Publication Activity Database

    Neykova, Neda; Moulin, E.; Campa, A.; Hruška, Karel; Poruba, Aleš; Stückelberger, M.; Haug, F.J.; Topič, M.; Ballif, C.; Vaněček, Milan

    2015-01-01

    Roč. 212, č. 8 (2015), s. 1823-1829. ISSN 1862-6300 R&D Projects: GA MŠk 7E12029; GA ČR(CZ) GA14-05053S EU Projects: European Commission(XE) 283501 - FAST TRACK Institutional support: RVO:68378271 Keywords : amorphous materials * hydrothermal growth * nanostructures * silicon * solar cells * ZnO Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.616, year: 2014

  7. High-efficiency amorphous silicon solar cell on a periodic nanocone back reflector

    Energy Technology Data Exchange (ETDEWEB)

    Hsu, Ching-Mei; Cui, Yi [Department of Materials Science and Engineering, Durand Building, 496 Lomita Mall, Stanford University, Stanford, CA 94305-4034 (United States); Battaglia, Corsin; Pahud, Celine; Haug, Franz-Josef; Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, Rue Breguet 2, 2000 Neuchatel (Switzerland); Ruan, Zhichao; Fan, Shanhui [Department of Electrical Engineering, Stanford University (United States)

    2012-06-15

    An amorphous silicon solar cell on a periodic nanocone back reflector with a high 9.7% initial conversion efficiency is presented. The optimized back-reflector morphology provides powerful light trapping and enables excellent electrical cell performance. Up-scaling to industrial production of large-area modules should be possible using nanoimprint lithography. (Copyright copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  8. First Measurements of the Performance of New Semitransparent Amorphous Silicon Sensor Prototypes

    Energy Technology Data Exchange (ETDEWEB)

    Calderon, A.; Calvo, E.; Martinez-Rivero, C.; Matorras, F.; Rodrigo, T.; Sobron, M.; Vila, I.; Virto, A. L.; Alberdi, J.; Arce, P.; Barcala, J. M.; Ferrando, A.; Josa, M. I.; Luque, J. M.; Molinero, A.; Navarrete, J.; Oller, J. C.; Yuste, C.

    2004-07-01

    We present first results on the performance of a new generation of semitransparent amorphous silicon position detectors having good properties such as an intrinsic position resolution better than 5{mu}m, an spatial point reconstruction precision better than 10 {mu}m, deflection angles smaller than 10{mu}rad and transmission in the visible and NIR higher than 70%. In addition the sensitive area is very large: 30x30 cm''3. (Author) 10 refs.

  9. Investigation of an amorphous silicon flat-panel detector for ion radiography

    OpenAIRE

    Telsemeyer, Julia

    2012-01-01

    Using heavy ions in radiotherapy offers a good potential for targeted radiation of tumors and the ability to spare healthy tissue. Their characteristic interaction with matter holds the potential to employ ions for high-contrast radiographic imaging at a decreased dose in comparison to conventional X-ray imaging; however, it lacks simple detectors suitable for this purpose. In this study the performance of an amorphous silicon flat-panel detector, originally designed for photon imaging, was i...

  10. Characterization of an amorphous silicon flat panel for controlling the positioning accuracy of sheet

    International Nuclear Information System (INIS)

    It has established a method for measuring the position of the blades in a multi leaf collimator (MLC) used to measure dose portal imaging device (EPID) of amorphous silicon, and verified its accuracy using radiochromic films and measures water with diode Cuba, techniques perfectly well validated in our institution. This dose profiles are studied for each sheet and determine their position at the point which has 50% of the dose in the open field.

  11. First Measurements of the Performance of New Semitransparent Amorphous Silicon Sensor Prototypes

    International Nuclear Information System (INIS)

    We present first results on the performance of a new generation of semitransparent amorphous silicon position detectors having good properties such as an intrinsic position resolution better than 5μm, an spatial point reconstruction precision better than 10 μm, deflection angles smaller than 10μrad and transmission in the visible and NIR higher than 70%. In addition the sensitive area is very large: 30x30 cm3. (Author) 10 refs

  12. High Kerr nonlinearity hydrogenated amorphous silicon nanowires with low two photon absorption and high optical stability

    CERN Document Server

    Grillet, C; Monat, C; Grosse, P; Bakir, B Ben; Menezo, S; Fedeli, J M; Moss, David J

    2014-01-01

    We demonstrate optically stable amorphous silicon nanowires with both high nonlinear figure of merit (FOM) of ~5 and high nonlinearity Re({\\gamma}) = 1200W-1m-1. We observe no degradation in these parameters over the entire course of our experiments including systematic study under operation at 2 W coupled peak power (i.e. ~2GW/cm2) over timescales of at least an hour.

  13. Highly Efficient Hybrid Polymer and Amorphous Silicon Multijunction Solar Cells with Effective Optical Management.

    Science.gov (United States)

    Tan, Hairen; Furlan, Alice; Li, Weiwei; Arapov, Kirill; Santbergen, Rudi; Wienk, Martijn M; Zeman, Miro; Smets, Arno H M; Janssen, René A J

    2016-03-16

    Highly efficient hybrid multijunction solar cells are constructed with a wide-bandgap amorphous silicon for the front subcell and a low-bandgap polymer for the back subcell. Power conversion efficiencies of 11.6% and 13.2% are achieved in tandem and triple-junction configurations, respectively. The high efficiencies are enabled by deploying effective optical management and by using photoactive materials with complementary absorption. PMID:26780260

  14. Magneto-optical switch with amorphous silicon waveguides on magneto-optical garnet

    Science.gov (United States)

    Ishida, Eiichi; Miura, Kengo; Shoji, Yuya; Mizumoto, Tetsuya; Nishiyama, Nobuhiko; Arai, Shigehisa

    2016-08-01

    We fabricated a magneto-optical (MO) switch with a hydrogenated amorphous silicon waveguide on an MO garnet. The switch is composed of a 2 × 2 Mach–Zehnder interferometer (MZI). The switch state is controlled by an MO phase shift through a magnetic field generated by a current flowing in an electrode located on the MZI. The switching operation was successfully demonstrated with an extinction ratio of 11.7 dB at a wavelength of 1550 nm.

  15. Failure analysis of thin-film amorphous-silicon solar-cell modules

    Science.gov (United States)

    Kim, Q.

    1984-01-01

    A failure analysis of thin film amorphous silicon solar cell modules was conducted. The purpose of this analysis is to provide information and data for appropriate corrective action that could result in improvements in product quality and reliability. Existing techniques were expanded in order to evaluate and characterize degradational performance of a-Si solar cells. Microscopic and macroscopic defects and flaws that significantly contribute to performance degradation were investigated.

  16. Stable, highly nonlinear amorphous silicon nanowires with very low nonlinear absorption

    CERN Document Server

    Carletti, Luca; Grossec, Phillipe; Ben-Bakir, Badhise; Menezoc, Sylvie; Fedelic, Jean-Marc; Moss, David J; Monat, Christelle

    2014-01-01

    The nonlinear characteristics of hydrogenated amorphous silicon nanowires are experimentally demonstrated. A high nonlinear refractive index, n2=1.19 x 10-17 m2/W, combined with a low two-photon absorption, 0.14 x 10-11 m/W, resulted in a high nonlinear FOM of 5.5. Furthermore, systematic studies over hours of operational time under 2.2W of pulse peak power revealed no degradation of the optical response.

  17. CORRELATION BETWEEN ELECTRICAL AND VIBRATIONAL PROPERTIES OF CHLORINATED AND HYDROGENATED AMORPHOUS SILICON PREPARED BY GLOW DISCHARGE

    OpenAIRE

    Al Dallal, S.; Chevallier, J.; Kalem, S; Bourneix, J.

    1982-01-01

    Electrical conductivity and infrared transmission measurements have been carried out on chlorinated and hydrogenated amorphous silicon films prepared by glow discharge. Upon increasing the plasma power, we observed a change of transport mechanism, accompanied by an evolution of hydrogen and chlorine related bands. From this correlation between the transport and the infrared data we suggest that the evolution of SiCl2 species with the plasma power is mainly responsible for the change in bandga...

  18. HEATING OF CRYSTALLINE AND AMORPHOUS SILICON BY C-SWITCHED LASER RADIATION

    OpenAIRE

    Meyer, J.; Bartoli, F.; Kruer, M.

    1980-01-01

    A theory for optical heating in semiconductors has been formulated in terms of the coupled diffusion equations for heat and excess carriers. Closed-form solutions for the region near the surface of the material have been obtained in the general case where the optical and transport parameters of the semiconductor are allowed to depend in an arbitrary way on temperature and laser-generated carrier density. The theory is applied here to heating of crystalline and amorphous silicon by Q-switched ...

  19. Activated mechanisms in amorphous silicon: an activation-relaxation-technique study

    OpenAIRE

    Mousseau, N.; Barkema, G. T.

    1999-01-01

    At low temperatures, dynamics in amorphous silicon occurs through a sequence of discrete activated events that locally reorganize the topological network. Using the activation-relaxation technique, a data base containing over 8000 such events is generated, and the events are analyzed with respect to their energy barrier and asymmetry, displacement and volume expansion/contraction. Special attention is paid to those events corresponding to diffusing coordination defects. The energetics is not ...

  20. Relationship between defect density and charge carrier transport in amorphous and microcrystalline silicon

    OpenAIRE

    Astakhov, O.; Carius, R.; F. Finger; Petrusenko, Y.; Borysenko, V.; Barankov, D.

    2009-01-01

    The influence of dangling-bond defects and the position of the Fermi level on the charge carrier transport properties in undoped and phosphorous doped thin-film silicon with structure compositions all the way from highly crystalline to amorphous is investigated. The dangling-bond density is varied reproducibly over several orders of magnitude by electron bombardment and subsequent annealing. The defects are investigated by electron-spin-resonance and photoconductivity spectroscopies. Comparin...