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Sample records for amorphous carbon films

  1. Structural morphology of amorphous conducting carbon film

    Indian Academy of Sciences (India)

    P N Vishwakarma; V Prasad; S V Subramanyam; V Ganesan

    2005-10-01

    Amorphous conducting carbon films deposited over quartz substrates were analysed using X-ray diffraction and AFM technique. X-ray diffraction data reveal disorder and roughness in the plane of graphene sheet as compared to that of graphite. This roughness increases with decrease in preparation temperature. The AFM data shows surface roughness of carbon films depending on preparation temperatures. The surface roughness increases with decrease in preparation temperature. Also some nucleating islands were seen on the samples prepared at 900°C, which are not present on the films prepared at 700°C. Detailed analysis of these islands reveals distorted graphitic lattice arrangement. So we believe these islands to be nucleating graphitic. Power spectrum density (PSD) analysis of the carbon surface indicates a transition from the nonlinear growth mode to linear surface-diffusion dominated growth mode resulting in a relatively smoother surface as one moves from low preparation temperature to high preparation temperature. The amorphous carbon films deposited over a rough quartz substrate reveal nucleating diamond like structures. The density of these nucleating diamond like structures was found to be independent of substrate temperature (700–900°C).

  2. Buckling instability in amorphous carbon films

    Science.gov (United States)

    Zhu, X. D.; Narumi, K.; Naramoto, H.

    2007-06-01

    In this paper, we report the buckling instability in amorphous carbon films on mirror-polished sapphire (0001) wafers deposited by ion beam assisted deposition at various growth temperatures. For the films deposited at 150 °C, many interesting stress relief patterns are found, which include networks, blisters, sinusoidal patterns with π-shape, and highly ordered sinusoidal waves on a large scale. Starting at irregular buckling in the centre, the latter propagate towards the outer buckling region. The maximum length of these ordered patterns reaches 396 µm with a height of ~500 nm and a wavelength of ~8.2 µm. However, the length decreases dramatically to 70 µm as the deposition temperature is increased to 550 °C. The delamination of the film appears instead of sinusoidal waves with a further increase of the deposition temperature. This experimental observation is correlated with the theoretic work of Crosby (1999 Phys. Rev. E 59 R2542).

  3. ENHANCING ADHESION OF TETRAHEDRAL AMORPHOUS CARBON FILMS

    Institute of Scientific and Technical Information of China (English)

    Zhao Yuqing; Lin Yi; Wang Xiaoyan; Wang Yanwu; Wei Xinyu

    2005-01-01

    Objective The high energy ion bombardment technique is applied to enhancing the adhesion of the tetrahedral amorphous carbon (TAC) films deposited by the filtered cathode vacuum arc (FCVA). Methods The abrasion method, scratch method, heating and shaking method as well as boiling salt solution method is used to test the adhesion of the TAC films on various material substrates. Results The test results show that the adhesion is increased as the ion bombardment energy increases. However, if the bombardment energy were over the corresponding optimum value, the adhesion would be enhanced very slowly for the harder material substrates and drops quickly, for the softer ones. Conclusion The optimum values of the ion bombardment energy are larger for the harder materials than that for the softer ones.

  4. Source Molecular Effect on Amorphous Carbon Film Deposition

    OpenAIRE

    Kawazoe, Hiroki; Inayoshi, Takanori; Shinohara, Masanori; Matsuda, Yoshinobu; Fujiyama, Hiroshi; Nitta, Yuki; Nakatani, Tatsuyuki

    2009-01-01

    We investigated deposition process of amorphous carbon films using acetylene and methane as a source molecule, by using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). We found that deposited film structures were different due to source molecules.

  5. Coaxial carbon plasma gun deposition of amorphous carbon films

    International Nuclear Information System (INIS)

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented

  6. Coaxial carbon plasma gun deposition of amorphous carbon films

    Science.gov (United States)

    Sater, D. M.; Gulino, D. A.; Rutledge, S. K.

    1984-01-01

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented.

  7. Intrinsic graphene field effect transistor on amorphous carbon films

    OpenAIRE

    Tinchev, Savcho

    2013-01-01

    Fabrication of graphene field effect transistor is described which uses an intrinsic graphene on the surface of as deposited hydrogenated amorphous carbon films. Ambipolar characteristic has been demonstrated typical for graphene devices, which changes to unipolar characteristic if the surface graphene was etched in oxygen plasma. Because amorphous carbon films can be growth easily, with unlimited dimensions and no transfer of graphene is necessary, this can open new perspective for graphene ...

  8. Field Emission Properties of Nitrogen-doped Amorphous Carbon Films

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    Nitrogen-doped amorphous carbon thin films are deposited on the ceramic substrates coated with Ti film by using direct current magnetron sputtering technique at N2 and Ar gas mixture atmosphere during deposition. The field emission properties of the deposited films have been investigated. The threshold field as low as 5.93V/μm is obtained and the maximum current density increases from 4μA/cm2 to 20.67μA/cm2 at 10.67V/μm comparing with undoped amorphous film. The results show that nitrogen doping plays an important role in field emission of amorphous carbon thin films.

  9. Angular magnetoresistance in semiconducting undoped amorphous carbon thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sagar, Rizwan Ur Rehman; Saleemi, Awais Siddique; Zhang, Xiaozhong, E-mail: xzzhang@tsinghua.edu.cn [Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, People' s Republic of China and Beijing National Center for Electron Microscopy, Beijing 100084 (China)

    2015-05-07

    Thin films of undoped amorphous carbon thin film were fabricated by using Chemical Vapor Deposition and their structure was investigated by using High Resolution Transmission Electron Microscopy and Raman Spectroscopy. Angular magnetoresistance (MR) has been observed for the first time in these undoped amorphous carbon thin films in temperature range of 2 ∼ 40 K. The maximum magnitude of angular MR was in the range of 9.5% ∼ 1.5% in 2 ∼ 40 K. The origin of this angular MR was also discussed.

  10. Infrared analysis of thin films amorphous, hydrogenated carbon on silicon

    CERN Document Server

    Jacob, W; Schwarz-Selinger, T

    2000-01-01

    The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-deposited, amorphous, hydrogenated carbon layers (a-C:H) on silicon substrates. The framework for the optical analysis of thin films is presented. The main characteristic of thin film optics is the occurrence of interference effects due to the coherent superposition of light multiply reflected at the various internal and external interfaces of the optical system. These interference effects lead to a sinusoidal variation of the transmitted and reflected intensity. As a consequence, the Lambert-Beer law is not applicable for the determination of the absorption coefficient of thin films. Furthermore, observable changes of the transmission and reflection spectra occur in the vicinity of strong absorption bands due to the Kramers-Kronig relation. For a sound data evaluation these effects have to be included in the analysis. To be able to extract the full information contained in a measured optical thin film spectrum, ...

  11. Gas desorption during friction of amorphous carbon films

    Science.gov (United States)

    Rusanov, A.; Fontaine, J.; Martin, J.-M.; Mogne, T. L.; Nevshupa, R.

    2008-03-01

    Gas desorption induced by friction of solids, i.e. tribodesorption, is one of the numerous physical and chemical phenomena, which arise during friction as result of thermal and structural activation of material in a friction zone. Tribodesorption of carbon oxides, hydrocarbons, and water vapours may lead to significant deterioration of ultra high vacuum conditions in modern technological equipment in electronic, optoelectronic industries. Therefore, knowledge of tribodesorption is crucial for the performance and lifetime of vacuum tribosystems. Diamond-like carbon (DLC) coatings are interesting materials for vacuum tribological systems due to their high wear resistance and low friction. Highly hydrogenated amorphous carbon (a-C:H) films are known to exhibit extremely low friction coefficient under high vacuum or inert environment, known as 'superlubricity' or 'superlow friction'. However, the superlow friction period is not always stable and then tends to spontaneous transition to high friction. It is supposed that hydrogen supply from the bulk to the surface is crucial for establishing and maintaining superlow friction. Thus, tribodesorption can serve also as a new technique to determine the role of gases in superlow friction mechanisms. Desorption of various a-C:H films, deposited by PECVD, ion-beam deposition and deposition using diode system, has been studied by means of ultra-high vacuum tribometer equipped with a mass spectrometer. It was found that in superlow friction period desorption rate was below the detection limit in the 0-85 mass range. However, transition from superlow friction to high friction was accompanied by desorption of various gases, mainly of H2 and CH4. During friction transition, surfaces were heavily damaged. In experiments with DLC films with low hydrogen content tribodesorption was significant during the whole experiment, while low friction was not observed. From estimation of maximum surface temperature during sliding contact it was

  12. Ion beam deposition of amorphous carbon films with diamond like properties

    Science.gov (United States)

    Angus, John C.; Mirtich, Michael J.; Wintucky, Edwin G.

    1982-01-01

    Carbon films were deposited on silicon, quartz, and potassium bromide substrates from an ion beam. Growth rates were approximately 0.3 micron/hour. The films were featureless and amorphous and contained only carbon and hydrogen in significant amounts. The density and carbon/hydrogen ratio indicate the film is a hydrogen deficient polymer. One possible structure, consistent with the data, is a random network of methylene linkages and tetrahedrally coordinated carbon atoms.

  13. Hardness and stress of amorphous carbon film deposited by glow discharge and ion beam assisting deposition

    CERN Document Server

    Marques, F C

    2000-01-01

    The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp sup 2 -rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp sup 3 sites. Furthermore, the same results also indicate that the sp sup 2 sites may also contribute to the hardness of the films.

  14. Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing

    Energy Technology Data Exchange (ETDEWEB)

    McCann, R. [NIBEC, School of Electrical and Mechanical Engineering, University of Ulster at Jordanstown, Newtownabbey, Co. Antrim, BT37 OQB, N. Ireland (United Kingdom); Roy, S.S. [NIBEC, School of Electrical and Mechanical Engineering, University of Ulster at Jordanstown, Newtownabbey, Co. Antrim, BT37 OQB, N. Ireland (United Kingdom)]. E-mail: s.sinha-roy@ulster.ac.uk; Papakonstantinou, P. [NIBEC, School of Electrical and Mechanical Engineering, University of Ulster at Jordanstown, Newtownabbey, Co. Antrim, BT37 OQB, N. Ireland (United Kingdom); Bain, M.F. [Queens University of Belfast, School of Elect and Elect Engineering, Belfast, Antrim, N. Ireland (United Kingdom); Gamble, H.S. [Queens University of Belfast, School of Elect and Elect Engineering, Belfast, Antrim, N. Ireland (United Kingdom); McLaughlin, J.A. [NIBEC, School of Electrical and Mechanical Engineering, University of Ulster at Jordanstown, Newtownabbey, Co. Antrim, BT37 OQB, N. Ireland (United Kingdom)

    2005-06-22

    Tetrahedral amorphous carbon (ta-C) and nitrogenated tetrahedral amorphous carbon films (ta-CN {sub x}), deposited by double bend off plane Filtered Vacuum Cathodic Arc were annealed up to 1000 deg. C in flowing argon for 2 min. Modifications on the chemical bonding structure of the rapidly annealed films, as a function of temperature, were investigated by NEXAFS, X-ray photoelectron and Raman spectroscopies. The interpretation of these spectra is discussed. The results demonstrate that the structure of undoped ta-C films prepared at floating potential with an arc current of 80 A remains stable up to 900 deg. C, whereas that of ta-CN {sub x} containing 12 at.% nitrogen is stable up to 700 deg. C. At higher temperatures, all the spectra indicated the predominant formation of graphitic carbon. Through NEXAFS studies, we clearly observed three {pi}* resonance peaks at the {sup '}N K edge structure. The origin of these three peaks is not well established in the literature. However our temperature-dependant study ascertained that the first peak originates from C=N bonds and the third peak originates from the incorporation of nitrogen into the graphite like domains.

  15. Nano-structural Modification of Amorphous Carbon Thin Films by Low-energy Electron Beam Irradiation

    Institute of Scientific and Technical Information of China (English)

    EijiIwamura; MasanoriYamaguchi

    2004-01-01

    A new approach using a low-energy electron beam radiation system was investigated to synthesize carbon hybrid structures in amorphous carbon thin films. Two types of amorphous carbon films, which were 15at% iron containing film and with column/inter-column structures, were deposited onto Si substrates by a sputtering technique and subsequently exposed to an electron shower of which the energy and dose rate were much smaller compared to an intense electron beam used in a transmission electron microscopy. As a result of the low-energy and low-dose electron irradiation process, graphitic structures formed in amorphous matrix at a relatively low temperature up to 450 K. Hybrid carbon thin films containing onion-like structures in an amorphous carbon matrix were synthesized by dynamic structural modification of iron containing amorphous carbon thin films. It was found that the graphitization progressed more in the electron irradiation than in annealing at 773K, and it was attributed to thermal and catalytic effects which are strongly related to grain growth of metal clusters. On the other hand, a reversal of TEM image contrast was observed in a-C films with column/inter-column structures. It is presumed that preferable graphitization occurred in the inter-column regions induced by electron irradiation.

  16. Nano-structural Modification of Amorphous Carbon Thin Films by Low-energy Electron Beam Irradiation

    Institute of Scientific and Technical Information of China (English)

    Eiji Iwamura; Masanori Yamaguchi

    2004-01-01

    A new approach using a low-energy electron beam radiation system was investigated to synthesize carbon hybrid structures in amorphous carbon thin films. Two types of amorphous carbon films, which were 15at% iron containing film and with column/inter-column structures, were deposited onto Si substrates by a sputtering technique and subsequently exposed to an electron shower of which the energy and dose rate were much smaller compared to an intense electron beam used in a transmission electron microscopy. As a result of the low-energy and low-dose electron irradiation process,graphitic structures formed in amorphous matrix at a relatively low temperature up to 450 K. Hybrid carbon thin films containing onion-like structures in an amorphous carbon matrix were synthesized by dynamic structural modification of iron containing amorphous carbon thin films. It was found that the graphitization progressed more in the electron irradiation than in annealing at 773K, and it was attributed to thermal and catalytic effects which are strongly related to grain growth of metal clusters. On the other hand, a reversal of TEM image contrast was observed in a-C films with column/inter-column structures. It is presumed that preferable graphitization occurred in the inter-column regions induced by electron irradiation.

  17. Opto-electrical properties of amorphous carbon thin film deposited from natural precursor camphor

    Energy Technology Data Exchange (ETDEWEB)

    Pradhan, Debabrata [Department of Chemistry, Indian Institute of Technology Bombay, Mumbai 400 076 (India)]. E-mail: dpradhan@sciborg.uwaterloo.ca; Sharon, Maheshwar [Department of Chemistry, Indian Institute of Technology Bombay, Mumbai 400 076 (India)

    2007-06-30

    A simple thermal chemical vapor deposition technique is employed for the pyrolysis of a natural precursor 'camphor' and deposition of carbon films on alumina substrate at higher temperatures (600-900 deg. C). X-ray diffraction measurement reveals the amorphous structure of these films. The carbon films properties are found to significantly vary with the deposition temperatures. At higher deposition temperature, films have shown predominately sp{sup 2}-bonded carbon and therefore, higher conductivity and lower optical band gap (Tauc gap). These amorphous carbon (a-C) films are also characterized with Raman and X-ray photoelectron spectroscopy. In addition, electrical and optical properties are measured. The thermoelectric measurement shows these as-grown a-C films are p-type in nature.

  18. Self-lubricated Array Film of Amorphous Carbon Nanorods on an Aluminum Substrate

    Institute of Scientific and Technical Information of China (English)

    JIANGChun-xi; TUJiang-ping; GUOShao-yi; FUMing-fu; ZHAOXin-bing

    2004-01-01

    A self-lubricated array film of amorphous carbon nanorods was prepared by chemical catalytic pyrolysis of acetylene on the anodic aluminum oxide membrane fabricated by two-step anodization of aluminum. The tribological properties of the array film of amorphous carbon nanorods in ambient air were investigated using a ball-on-disk tester at applied loads range from 245 mN to 1960 mN at a sliding velocity of 0.2 m/s. The self-lubricated array film exhibited a small value of the friction coefficient as well as good wear resistance. The friction coefficient of array film of amorphous carbon nanorods decreased gradually with increasing the applied load. The approach proposed demonstrated a new efficient route towards enhanced the friction and wear performances of aluminum.

  19. Single walled carbon nanotube network—Tetrahedral amorphous carbon composite film

    Energy Technology Data Exchange (ETDEWEB)

    Iyer, Ajai, E-mail: ajai.iyer@aalto.fi; Liu, Xuwen; Koskinen, Jari [Department of Materials Science and Engineering, School of Chemical Technology, Aalto University, POB 16200, 00076 Espoo (Finland); Kaskela, Antti; Kauppinen, Esko I. [NanoMaterials Group, Department of Applied Physics, School of Science, Aalto University, POB 15100, 00076 Espoo (Finland); Johansson, Leena-Sisko [Department of Forest Products Technology, School of Chemical Technology, Aalto University, POB 16400, 00076 Espoo (Finland)

    2015-06-14

    Single walled carbon nanotube network (SWCNTN) was coated by tetrahedral amorphous carbon (ta-C) using a pulsed Filtered Cathodic Vacuum Arc system to form a SWCNTN—ta-C composite film. The effects of SWCNTN areal coverage density and ta-C coating thickness on the composite film properties were investigated. X-Ray photoelectron spectroscopy measurements prove the presence of high quality sp{sup 3} bonded ta-C coating on the SWCNTN. Raman spectroscopy suggests that the single wall carbon nanotubes (SWCNTs) forming the network survived encapsulation in the ta-C coating. Nano-mechanical testing suggests that the ta-C coated SWCNTN has superior wear performance compared to uncoated SWCNTN.

  20. Wettability and biocompatibility of nitrogen-doped hydrogenated amorphous carbon films: Effect of nitrogen

    International Nuclear Information System (INIS)

    Amorphous carbon films have been applied in biomedical fields as potential biocompatible materials with wettability that can be adjusted by doping with other elements, including F, Si, Ti, O and N. In this study, nitrogen-doped hydrogenated amorphous carbon (a-C:H:N) films were deposited by PIII-D using C2H2 + N2 gas mixtures. The biocompatibility and anti-thrombotic properties of the films were assessed in vitro. The surface morphology and surface wettability of the films were characterized using atomic force microscopy (AFM) and a contact angle method. The results show no cytotoxicity for all films, and films with appropriate nitrogen doping possess much better endothelial cell growth and anti-thrombotic properties

  1. X-ray photoelectron spectroscopic study of nitrogen incorporated amorphous carbon films embedded with nanoparticles

    International Nuclear Information System (INIS)

    The effect of substrate bias on X-ray photoelectron spectroscopy (XPS) study of nitrogen incorporated amorphous carbon (a-C:N) films embedded with nanoparticles deposited by filtered cathodic jet carbon arc technique is discussed. High resolution transmission electron microscope exhibited initially the amorphous structure but on closer examination the film was constituted of amorphous phase with the nanoparticle embedded in the amorphous matrix. X-ray diffraction study reveals dominantly an amorphous nature of the film. A straight forward method of deconvolution of XPS spectra has been used to evaluate the sp3 and sp2 contents present in these a-C:N films. The carbon (C 1s) peaks have been deconvoluted into four different peaks and nitrogen (N 1s) peaks have been deconvoluted into three different peaks which attribute to different bonding state between C, N and O. The full width at half maxima (FWHM) of C 1s peak, sp3 content and sp3/sp2 ratio of a-C:N films increase up to -150 V substrate bias and beyond -150 V substrate bias these parameters are found to decrease. Thus, the parameters evaluated are found to be dependent on the substrate bias which peaks at -150 V substrate bias.

  2. Facile fabrication of boron nitride nanosheets-amorphous carbon hybrid film for optoelectronic applications

    KAUST Repository

    Wan, Shanhong

    2015-01-01

    A novel boron nitride nanosheets (BNNSs)-amorphous carbon (a-C) hybrid film has been deposited successfully on silicon substrates by simultaneous electrochemical deposition, and showed a good integrity of this B-C-N composite film by the interfacial bonding. This synthesis can potentially provide the facile control of the B-C-N composite film for the potential optoelectronic devices. This journal is

  3. Field Emission from Amorphous carbon Nitride Films Deposited on silicon Tip Arrays

    Institute of Scientific and Technical Information of China (English)

    李俊杰; 郑伟涛; 孙龙; 卞海蛟; 金曾孙; 赵海峰; 宋航; 孟松鹤; 赫晓东; 韩杰才

    2003-01-01

    Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx films. In addition, the films deposited on silicon tips have a smaller effective work function ( F = 0.024 eV)of electron field emission than that on silicon wafer ( F = 0.060 e V), which indicates a significant enhancement of the ability of electron field emission from a-CNx films.

  4. Structural and mechanical properties of amorphous carbon films deposited by the dual plasma technique

    Institute of Scientific and Technical Information of China (English)

    Yaohui Wang; Xu Zhang; Xianying Wu; Huixing Zhang; Xiaoji Zhang

    2008-01-01

    Direct current metal filtered cathodic vacuum are (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallo-graphic orientation exists in the film, and rite main existing pattern of carbon is sp2. With increasing the acetylene flow rate, the con-tents of Ti and TiC phase of the film gradually reduce; however, the thickness of the film increases. When the substrate bias voltage reaches -600 V, the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa, respectively, and the friction coefficient of the film is 0.25.

  5. Effect of Substrate Bias on Microstructure and Properties of Tetrahedral Amorphous Carbon Films

    Institute of Scientific and Technical Information of China (English)

    Jiaqi ZHU; Jiecai HAN; Songhe MENG; Qiang LI; Manlin TAN

    2003-01-01

    The microstructure and properties of tetrahedral amorphous carbon (ta-C) films deposited by the filtered cathodic vacuum arc technology has been investigated by visible Raman spectroscopy, AFM and Nano-indentor. The Raman spectra have been fitted with a s

  6. Electron emission degradation of nano-structured sp2-bonded amorphous carbon films

    Institute of Scientific and Technical Information of China (English)

    Lu Zhan-Ling; Wang Chang-Qing; Jia Yu; Zhang Bing-Lin; Yao Ning

    2007-01-01

    The initial field electron emission degradation behaviour of original nano-structured sp2-bonded amorphous carbon films has been observed.which can be attributed to the increase of the work function of the film in the field emission process analysed using a Fowler-Nordheim plot.The possible re.on for the change of work function is suggested to be the desorption of hydrogen from the original hydrogen termination film surface due to field emission current-induced local heating.For the explanation of the emission degradation behaviour of the nano-structured sp2-bonded amorphous carbon film,a cluster model with a series of graphite(0001) basal surfaces has been presented,and the theoretical calculations have been performed to investigate work functions of graphite(0001) surfaces with different hydrogen atom and ion chemisorption sites by using first principles method based on density functional theory-local density approximation.

  7. Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Ti-containing carbon films were deposited by using magnetron sputtering deposition. The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; C1s peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp2 and sp3, respectively, and sp2 is superior to sp3. This Ti-containing film with dominating sp2 bonds is nanocomposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.

  8. Amorphous carbon film deposition on inner surface of tubes using atmospheric pressure pulsed filamentary plasma source

    CERN Document Server

    Pothiraja, Ramasamy; Awakowicz, Peter

    2011-01-01

    Uniform amorphous carbon film is deposited on the inner surface of quartz tube having the inner diameter of 6 mm and the outer diameter of 8 mm. A pulsed filamentary plasma source is used for the deposition. Long plasma filaments (~ 140 mm) as a positive discharge are generated inside the tube in argon with methane admixture. FTIR-ATR, XRD, SEM, LSM and XPS analyses give the conclusion that deposited film is amorphous composed of non-hydrogenated sp2 carbon and hydrogenated sp3 carbon. Plasma is characterized using optical emission spectroscopy, voltage-current measurement, microphotography and numerical simulation. On the basis of observed plasma parameters, the kinetics of the film deposition process is discussed.

  9. Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method

    Institute of Scientific and Technical Information of China (English)

    徐骏; 黄晓辉; 李伟; 王立; 陈坤基

    2002-01-01

    A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layermethod) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemicalvapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentrationin the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed atroom temperature, as a result of the reduction of sp2 clusters in the films.

  10. Deposit of thin films of nitrided amorphous carbon using the laser ablation technique

    International Nuclear Information System (INIS)

    It is reported the synthesis and characterization of thin films of amorphous carbon (a-C) nitrided, deposited by laser ablation in a nitrogen atmosphere at pressures which are from 4.5 x 10 -4 Torr until 7.5 x 10 -2 Torr. The structural properties of the films are studied by Raman spectroscopy obtaining similar spectra at the reported for carbon films type diamond. The study of behavior of the energy gap and the ratio nitrogen/carbon (N/C) in the films, shows that the energy gap is reduced when the nitrogen incorporation is increased. It is showed that the refraction index of the thin films diminish as nitrogen pressure is increased, indicating the formation of graphitic material. (Author)

  11. Amorphous Interface Layer in Thin Graphite Films Grown on the Carbon Face of SiC

    Energy Technology Data Exchange (ETDEWEB)

    Colby, R.; Stach, E.; Bolen, M.L.; Capano, M.A.

    2011-09-05

    Cross-sectional transmission electron microscopy (TEM) is used to characterize an amorphous layer observed at the interface in graphite and graphene films grown via thermal decomposition of C-face 4H-SiC. The amorphous layer does not cover the entire interface, but uniform contiguous regions span microns of cross-sectional interface. Scanning transmission electron microscopy (STEM) images and electron energy loss spectroscopy (EELS) demonstrate that the amorphous layer is a carbon-rich composition of Si/C. The amorphous layer is clearly observed in samples grown at 1600 C for a range of growth pressures in argon, but not at 1500 C, suggesting a temperature-dependent formation mechanism.

  12. Platinum containing amorphous hydrogenated carbon (a-C:H/Pt) thin films as selective solar absorbers

    Energy Technology Data Exchange (ETDEWEB)

    Lan, Yung-Hsiang; Brahma, Sanjaya [Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan (China); Tzeng, Y.H. [Department of Electrical Engineering, National Cheng Kung University, Tainan 701, Taiwan (China); Ting, Jyh-Ming, E-mail: jting@mail.ncku.edu.tw [Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan (China); Research Center for Energy Technology and Strategy, National Cheng Kung University, Tainan 701, Taiwan (China)

    2014-10-15

    We have investigated a double-cermet structured thin film in which an a-C:H thin film was used as an anti-reflective (AR) layer and two platinum-containing amorphous hydrogenated carbon (a-C:H/Pt) thin films were used as the double cermet layers. A reactive co-sputter deposition method was used to prepare both the anti-reflective and cermet layers. Effects of the target power and heat treatment were studied. The obtained films were characterized using X-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy. The optical absorptance and emittance of the as deposited and annealed films were determined using UV–vis-NIR spectroscopy. We show that the optical absorptance of the resulting double-cermet structured thin film is as high as 96% and remains to be 91% after heat treatment at 400 °C, indicating the thermal stability of the film.

  13. Silicon and aluminum doping effects on the microstructure and properties of polymeric amorphous carbon films

    Science.gov (United States)

    Liu, Xiaoqiang; Hao, Junying; Xie, Yuntao

    2016-08-01

    Polymeric amorphous carbon films were prepared by radio frequency (R.F. 13.56 MHz) magnetron sputtering deposition. The microstructure evolution of the deposited polymeric films induced by silicon (Si) and aluminum(Al) doping were scrutinized through infrared spectroscopy, multi-wavelength Raman spectroscopy, scanning electron microscopy (SEM) and high resolution transmission electron microscopy (HRTEM). The comparative results show that Si doping can enhance polymerization and Al doping results in an increase in the ordered carbon clusters. Si and Al co-doping into polymeric films leads to the formation of an unusual dual nanostructure consisting of cross-linked polymer-like hydrocarbon chains and fullerene-like carbon clusters. The super-high elasticity and super-low friction coefficients (<0.002) under a high vacuum were obtained through Si and Al co-doping into the films. Unconventionally, the co-doped polymeric films exhibited a superior wear resistance even though they were very soft. The relationship between the microstructure and properties of the polymeric amorphous carbon films with different elements doping are also discussed in detail.

  14. Electron field emission from 2-induced insulating to metallic behaviour of amorphous carbon (-C) films

    Indian Academy of Sciences (India)

    Pitamber Mahanandia; P N Viswakarma; Prasad Vishnu Bhotla; S V Subramanyam; Karuna Kar Nanda

    2010-06-01

    The influence of concentration and size of 2 cluster on the transport properties and electron field emissions of amorphous carbon films have been investigated. The observed insulating to metallic behaviour from reduced activation energy derived from transport measurement and threshold field for electron emission of -C films can be explained in terms of improvements in the connectivity between 2 clusters. The connectivity is resulted by the cluster concentration and size. The concentration and size of 2 content cluster is regulated by the coalescence of carbon globules into clusters, which evolves with deposition conditions.

  15. Incorporation of Nitrogen into Amorphous Carbon Films Produced by Surface-Wave Plasma Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    Wu Yuxiang(吴玉祥); Zhu Xiaodong(朱晓东); Zhan Rujuan(詹如娟)

    2003-01-01

    In order to study the influence of nitrogen incorporated into amorphous carbon films,nitrogenated amorphous carbon films have been deposited by using surface wave plasma chemical vapor deposition under various ratios of N2/CH4 gas flow. Optical emission spectroscopy has been used to monitor plasma features near the deposition zone. After deposition, the samples are checked by Raman spectroscopy and x-ray photo spectroscopy (XPS). Optical emission intensities of CH and N atom in the plasma are found to be enhanced with the increase in the N2/CH4 gas flow ratio, and then reach their maximums when the N2/CH4 gas flow ratio is 5%. A contrary variation is found in Raman spectra of deposited films. The intensity ratio of the D band to the G band (ID/IG) and the peak positions of the G and D bands all reach their minimums when the N2/CH4 gas flow ratio is 5%. These show that the structure of amorphous carbon films has been significantly modified by introduction of nitrogen.

  16. Amorphous Carbon Gold Nanocomposite Thin Films: Structural and Spectro-ellipsometric Analysis

    Energy Technology Data Exchange (ETDEWEB)

    Montiel-Gonzalez, Z., E-mail: zeuzmontiel@hotmail.com [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, Ciudad Universitaria, Coyoacan 04510, Mexico D.F (Mexico); Rodil, S.E.; Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, Ciudad Universitaria, Coyoacan 04510, Mexico D.F (Mexico); Mendoza-Galvan, A. [Centro de Investigacion y de Estudios Avanzados del Instituto Politecnico Nacional, Unidad Queretaro, 76010 Queretaro, Queretaro (Mexico); Rodriguez-Fernandez, L. [Instituto de Fisica, Universidad Nacional Autonoma de Mexico, Circuito de la Investigacion Cientifica, Ciudad Universitaria, 04510, Mexico D.F (Mexico)

    2011-07-01

    Spectroscopic Ellipsometry was used to determine the optical and structural properties of amorphous carbon:gold nanocomposite thin films deposited by dc magnetron co-sputtering at different deposition power. The incorporation of gold as small particles distributed in the amorphous carbon matrix was confirmed by X-ray Diffraction, Rutherford Backscattering measurements and High Resolution Transmission Electron Microscopy. Based on these results, an optical model for the films was developed using the Maxwell-Garnett effective medium with the Drude-Lorentz model representing the optical response of gold and the Tauc-Lorentz model for the amorphous carbon. The gold volume fraction and particle size obtained from the fitting processes were comparable to those from the physical characterization. The analysis of the ellipsometric spectra for all the samples showed strong changes in the optical properties of the carbon films as a consequence of the gold incorporation. These changes were correlated to the structural modification observed by Raman Spectroscopy, which indicated a clustering of the sp{sup 2} phase with a subsequent decrease in the optical gap. Finally, measurements of Reflection and Transmission Spectroscopy were carried out and Transmission Electron Microscopy images were obtained in order to support the ellipsometric model results.

  17. Synthesis and characterization of thin films of nitrided amorphous carbon deposited by laser ablation

    International Nuclear Information System (INIS)

    The objective of this work is the synthesis and characterization of thin films of amorphous carbon (a-C) and thin films of nitrided amorphous carbon (a-C-N) using the laser ablation technique for their deposit. For this purpose, the physical properties of the obtained films were studied as function of diverse parameters of deposit such as: nitrogen pressure, power density, substrate temperature and substrate-target distance. For the characterization of the properties of the deposited thin films the following techniques were used: a) Raman spectroscopy which has demonstrated being a sensitive technique to the sp2 and sp3 bonds content, b) Energy Dispersive Spectroscopy which allows to know semi-quantitatively way the presence of the elements which make up the deposited films, c) Spectrophotometry, for obtaining the absorption spectra and subsequently the optical energy gap of the deposited material, d) Ellipsometry for determining the refraction index, e) Scanning Electron Microscopy for studying the surface morphology of thin films and, f) Profilemetry, which allows the determination the thickness of the deposited thin films. (Author)

  18. Electronic state modification in laser deposited amorphous carbon films by the inclusion of nitrogen

    OpenAIRE

    Y. Miyajima; Adamopoulos, G; Henley, SJ; V.Stolojan; Tison, Y; Garcia-Caurel, E; Drevillon, B.; Shannon, JM; Silva, SRP

    2008-01-01

    In this study, we investigate the effect of the inclusion of nitrogen in amorphous carbon thin films deposited by pulsed laser deposition, which results in stress induced modifications to the band structure and the concomitant changes to the electronic transport properties. The microstructural changes due to nitrogen incorporation were examined using electron energy-loss spectroscopy and Raman scattering. The band structure was investigated using spectroscopic ellipsometry data in the range o...

  19. Nitrogen doping and structural properties of amorphous carbon films deposited by pulsed laser ablation

    Science.gov (United States)

    Rusop, M.; Mominuzzaman, S. M.; Tian, X. M.; Soga, T.; Jimbo, T.; Umeno, M.

    2002-09-01

    Nitrogen (N) was successfully introduced into amorphous carbon (a-C) films by ablating carbon (C) from a camphoric carbon (CC) target with varying ambient N partial pressure (NPP) using pulsed laser ablation (PLA). We found that the N content in the film changed on varying the NPP. The room temperature conductivity ( σRT) decreases initially at 0.1 mTorr and then increases at higher NPP up to 30 mTorr and decreases thereafter. We can relate this variation to doping of N in the films for low N content as the optical gap ( Eg) remains unchanged till the film is deposited at 1 mTorr. Scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy studies also suggest that no graphitization whatsoever occurs in the film after N addition up to 1 mTorr. Although no structural change in the films was found with N addition up to 1 mTorr, the σRT depends on the N content. With higher NPP up to 30 mTorr, since Eg decreases with increasing σRT, we related this phenomenon to the graphitization. However, above 30 mTorr, since Eg increases with the decrease of σRT, we related this phenomenon to the structural change in the film.

  20. Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films

    International Nuclear Information System (INIS)

    In this work, amorphous hydrogenated carbon (a-C:H), SiOx containing a-C:H (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx (a-C:H:N/SiOx) thin films were deposited on chromium thin film coated glass using a closed drift ion beam source. Acetylene gas, hexamethyldisiloxane and hydrogen or 20% nitrogen/hydrogen mixture were used as precursors. Resulting hydrogenated carbon thin film surface morphology as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy analysis. Surface analysis was also performed using atomic force microscopy via topography, surface morphology parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements. The a-C:H/SiOx and a-C:H:N/SiOx thin films showed better mechanical strength as compared to the conventional a-C:H films. X-ray photoelectron spectroscopy was used to determine the chemical composition of these films. It showed increased amounts of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiOx thin film which was attributed to its improved mechanical properties.

  1. Inprovement of Field Emission Properties of PBS Thin Films by Amorphous Carbon Coating

    Directory of Open Access Journals (Sweden)

    S. Jana

    2011-01-01

    Full Text Available Lead sulfide (PbS nanocrystalline thin films were synthesized at room temperature via chemical bath deposition on both silicon and glass substrates and coated with amorphous carbon of different thickness by varying deposition time in plasma enhanced chemical vapor deposition technique. The as prepared samples were characterized by X-ray diffraction (XRD, field emission scanning electron microscope (FESEM and atomic force microscope (AFM. XRD study reveals that coating of amorphous carbon does not change the crystal structure of PbS. From FESEM images it is seen that the average size of PbS nanoparticle does not exceed 100 nm, though sometomes small cubic particles agglomerated to form bigger particles. The coating of amorphous carbon can be clearly visible by the FESEM as well as from AFM micrographs. Field emission study show a significant betterment for the carbon coated sample as compared to the pure PbS. The effect of inter-electrode distance on the field emission characteristics of best field emitting sample has been studied for three different inter-electrode distances.

  2. Strain-induced photoconductivity in thin films of Co doped amorphous carbon.

    Science.gov (United States)

    Jiang, Y C; Gao, J

    2014-01-01

    Traditionally, strain effect was mainly considered in the materials with periodic lattice structure, and was thought to be very weak in amorphous semiconductors. Here, we investigate the effects of strain in films of cobalt-doped amorphous carbon (Co-C) grown on 0.7PbMg(1/3)Nb(2/3)O3-0.3PbTiO3 (PMN-PT) substrates. The electric transport properties of the Co-C films were effectively modulated by the piezoelectric substrates. Moreover, we observed, for the first time, strain-induced photoconductivity in such an amorphous semiconductor. Without strain, no photoconductivity was observed. When subjected to strain, the Co-C films exhibited significant photoconductivity under illumination by a 532-nm monochromatic light. A strain-modified photoconductivity theory was developed to elucidate the possible mechanism of this remarkable phenomenon. The good agreement between the theoretical and experimental results indicates that strain-induced photoconductivity may derive from modulation of the band structure via the strain effect. PMID:25338641

  3. Superior tribological properties of an amorphous carbon film with a graphite-like structure

    Institute of Scientific and Technical Information of China (English)

    Wang Yong-Jun; Li Hong-Xuan; Ji Li; Liu Xiao-Hong; Wu Yan-Xia; Zhou Hui-Di; Chen Jian-Min

    2012-01-01

    Amorphous carbon films with high sp2 concentrations are deposited by unbalanced magnetron sputtering with a narrow range of substrate bias voltage. Field emission scanning electron microscopes (FESEMs),high resolution transmission electron microscopes (HRTEMs),atomic force microscopes (AFMs),the Raman spectrometers,nanoindentation,and tribometers are subsequently used to characterize the microstructures and the properties of the resulting films.It is found that the present films are dominated by the sp2 sites.However,the films demonstrate a moderate hardness together with a low internal stress.The high hardness of the deposited film originates from the crosslinking of the sp2 clusters by the sp3 sites.The presence of the graphite-like clusters in the film structure may be responsible for the low internal stress.What is more important is that the resulting films show excellent tribological properties with high load capacity and excellent wear resistance in humid atmospheres.The relationship between the microstructure determined by the deposition condition and the film characteristic is discussed in detail.

  4. Rapid thermal annealing of Amorphous Hydrogenated Carbon (a-C:H) films

    Science.gov (United States)

    Alterovitz, Samuel A.; Pouch, John J.; Warner, Joseph D.

    1987-01-01

    Amorphous hydrogenated carbon (a-C:H) films were deposited on silicon and quartz substrates by a 30 kHz plasma discharge technique using methane. Rapid thermal processing of the films was accomplished in nitrogen gas using tungsten halogen light. The rapid thermal processing was done at several fixed temperatures (up to 600 C), as a function of time (up to 1800 sec). The films were characterized by optical absorption and by ellipsometry in the near UV and the visible. The bandgap, estimated from extrapolation of the linear part of a Tauc plot, decreases both with the annealing temperature and the annealing time, with the temperature dependence being the dominating factor. The density of states parameter increases up to 25 percent and the refractive index changes up to 20 percent with temperature increase. Possible explanations of the mechanisms involved in these processes are discussed.

  5. Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions

    Directory of Open Access Journals (Sweden)

    Yoffe Alexander

    2015-09-01

    Full Text Available A study of the correlations between plasma parameters, gas ratios, and deposited amorphous carbon film properties is presented. The injection of a C4F8/Ar/N2 mixture of gases was successfully used in an inductively coupled plasma system for the preparation of amorphous carbon films with different fluoride doping at room-temperature, using silicon as a substrate. This coating was formed at low-pressure and low-energy using an inductively coupled plasma process. A strong dependence between the ratios of gases during deposition and the composition of the substrate compounds was shown. The values of ratios between Ar (or Ar+N2 and C4F8 - 1:1 and between N2 and Ar - 1:2 in the N2/Ar/C4F8 mixture were found as the best for low fluoridated coatings. In addition, an example of improving the etch-passivation in the Bosch procedure was described. Scanning electron microscopy with energy dispersive spectroscopy options, X-ray diffraction, and X-ray reflectivity were used for quantitative analysis of the deposited films.

  6. Formation of Ultrananocrystalline Diamond/Amorphous Carbon Composite Films in Vacuum Using Coaxial Arc Plasma Gun

    Science.gov (United States)

    Hanada, Kenji; Yoshida, Tomohiro; Nakagawa, You; Yoshitake, Tsuyoshi

    2010-12-01

    Ultrananocrystalline diamond (UNCD)/nonhydrogenated amorphous carbon (a-C) composite films were grown in vacuum using a coaxial arc plasma gun. From the X-ray diffraction measurement, the UNCD crystallite size was estimated to be 1.6 nm. This size is dramatically reduced from that (2.3 nm) of UNCD/hydrogenated amorphous carbon (a-C:H) composite films grown in a hydrogen atmosphere. The sp3/(sp3 + sp2) value, which was estimated from the X-ray photoemission spectrum, was also reduced to be 41%. A reason for it might be the reduction in the UNCD crystallite size. From the near-edge X-ray absorption fine-structure (NEXAFS) spectrum, it was found that the π*C=C and π*C≡C bonds are preferentially formed instead of the σ*C-H bonds in the UNCD/a-C:H films. Since the extremely small UNCD crystallites (1.6 nm) correspond to the nuclei of diamond, we consider that UNCD crystallite formation should be due predominantly to nucleation. The supersaturated condition required for nucleation is expected to be realized in the deposition using the coaxial arc plasma gun.

  7. Amorphous Hydrogenated Carbon-Nitrogen Alloy Thin Films for Solar Cell Application

    Institute of Scientific and Technical Information of China (English)

    ZHOU Zhi-Bin; DING Zheng-Ming; PANG Qian-Jun; CUI Rong-Qiang

    2001-01-01

    Amorphous hydrogenated carbon-nitrogen alloy (a-CNx :H) thin films have been deposited on silicon substratesby improved dc magnetron sputtering from a graphite target in nitrogen and hydrogen gas discharging. Thefilms are investigated by using Raman spectroscopy, x-ray photoelectron spectroscopy, spectral ellipsometer and electron spin resonance techniques. The optimized process condition for solar cell application is discussed. Thephotovoltaic property of a-CNx:H/silicon heterojunctions can be improved by the adjustment of the pressureratio of hydrogen to nitrogen and unbalanced magnetic field intensity. Open-circuit voltage and short-circuitcurrent reach 300mV and 5.52 Ma/cm2, respectively.

  8. Surface resistivity of hydrogenated amorphous carbon films: Existence of intrinsic graphene on its surface

    OpenAIRE

    Tinchev, Savcho

    2013-01-01

    Surface resistivity of hydrogenated amorphous carbon films was measured as a function of the applied electrical field. The measured dependence shows a sharp ambipolar peak near zero gate voltage. Furthermore, we found that in some samples sheet resistance at the peak is as low as 7.5 k{\\Omega}/sq. This value is the same order of magnitude as the sheet resistance of a defect free graphene monolayer. Therefore a conclusion is made that an intrinsic graphene with dimensions of at least millimete...

  9. Dependence of Structure and Haemocompatibility of Amorphous Carbon Films on Substrate Bias Voltage

    Institute of Scientific and Technical Information of China (English)

    GUO Yang-Ming; MO Dang; LI Zhe-Yi; LIU Yi; HE Zhen-Hui; CHEN Di-Hu

    2004-01-01

    @@ Tetrahedral amorphous hydrogenated carbon (ta-C:H) films on Si(100) substrates were prepared by using a magnetic-field-filter plasma stream deposition system. Samples with different ratios of spa-bond to sp2-bond were obtained by changing the bias voltage applied to the substrates. The ellipsometric spectra of various carbon films in the photon energy range of 1.9-5.4eV were measured. The refractive index n and the relative sp3 C ratio of these films were obtained by simulating their ellipsometric spectra using the Forouhi-Bloomer model and by using the Bruggeman effective medium approximation, respectively. The haemocompatibility of these ta-C:H films was analysed by observation of platelet adhesion and measurement of kinetic clotting time. The results show that the sp3 C fraction is dependent on the substrate bias voltage, and the haemocompatibility is dependent on the ratio of sp3-bond to sp2-bond. A good haemocompatibility material of ta-C:H films with a suitable sp3 C fraction can be prepared by changing the substrate bias voltage.

  10. Structural and Electrical Properties of Amorphous Hydrogen Carbon-Nitrogen Films

    Institute of Scientific and Technical Information of China (English)

    SUO Da-Cheng; LIU Yi-Chun; LIU Yan; QI Xiu-Ying; ZHONG Dian-Qiang

    2004-01-01

    @@ Amorphous hydrogenated carbon-nitrogen (a-C:H:(N)) films with different nitrogen contents have been deposited by using rf-sputtering of a high purity graphite target in an Ar-H2-N2 atmosphere. Transmittance and reflectance spectra are used to characterize the Tauc gap and absorption coefficients in the wavelength range 0.185-3.2μm.The temperature dependence of conductivity demonstrates a hopping mechanism of the Fermi level in the temperature range of 77-300K. The density of state at the Fermi level is derived from the direct current conductivity.The photoluminescence properties of a-C:H:N films were investigated. The photoluminescence peak has a blue shift with increasing excitation energy. These results are discussed on the basis of a model in which the different sp2 clusters dispersed in sp3 matrices.

  11. The multilayered structure of ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc deposition

    KAUST Repository

    Wang, Na

    2013-08-01

    The structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) deposition was investigated by high-resolution transmission electron microscopy, electron energy loss spectroscopy, and x-ray photoelectron spectroscopy. Results of the plasmon excitation energy shift and through-thickness elemental concentration show a multilayered a-C film structure comprising an interface layer consisting of C, Si, and, possibly, SiC, a buffer layer with continuously increasing sp 3 fraction, a relatively thicker layer (bulk film) of constant sp 3 content, and an ultrathin surface layer rich in sp 2 hybridization. A detailed study of the C K-edge spectrum indicates that the buffer layer between the interface layer and the bulk film is due to the partial backscattering of C+ ions interacting with the heavy atoms of the silicon substrate. The results of this study provide insight into the minimum thickness of a-C films deposited by FCVA under optimum substrate bias conditions. Copyright © 2013 Materials Research Society.

  12. Characterization of amorphous hydrogenated carbon films deposited by MFPUMST at different ratios of mixed gases

    Indian Academy of Sciences (India)

    Haiyang Dai; Changyong Zhan; Hui Jiang; Ningkang Huang

    2012-12-01

    Amorphous hydrogenated carbon films (-C:H) on -type (100) silicon wafers were prepared with a middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different ratios of methane–argon gases. The band characteristics, mechanical properties as well as refractive index were measured by Raman spectra, X-ray photoelectron spectroscopy (XPS), nano-indentation tests and spectroscopic ellipsometry. It is found that the 3 fraction increases with increasing Ar concentration in the range of 17–50%, and then decreases when Ar concentration exceeds 50%. The nano-indentation tests reveal that nano-hardness and elastic modulus of the films increase with increasing Ar concentration in the range of 17–50%, while decreases with increasing Ar concentration from 50% to 86%. The variations in the nano-hardness and the elastic modulus could be interpreted due to different 3 fractions in the prepared -C:H films. The variation of refractive index with wavelength have the same tendency for the -C:H films prepared at different Ar concentrations, they decrease with increasing wavelength from 600 to 1700 nm. For certain wavelengths within 600–1700 nm, refractive index has the highest value at the Ar concentration of 50%, and it is smaller at the Ar concentration of 86% than at 17%. The results given above indicate that ratio of mixed gases has a strong influence on bonding configuration and properties of -C:H films during deposition. The related mechanism is discussed in this paper.

  13. A study of the chemical, mechanical, and surface properties of thin films of hydrogenated amorphous carbon

    Energy Technology Data Exchange (ETDEWEB)

    Vandentop, G.J.

    1990-07-01

    Amorphous hydrogenated carbon (a-C:H) films were studied with the objective of elucidating the nucleation and growth mechanisms, and the origin of their unique physical properties. The films were deposited onto Si(100) substrates both on the powered (negatively self-biased) and on the grounded electrodes from methane in an rf plasma (13.56 MHz) at 65 mTorr and 300 to 370 K. The films produced at the powered electrode exhibited superior mechanical properties, such as high hardness. A mass spectrometer was used to identify neutral species and positive ions incident on the electrodes from the plasma, and also to measure ion energies. The effect of varying ion energy flux on the properties of a-C:H films was investigated using a novel pulsed biasing technique. It was demonstrated that ions were not the dominant deposition species as the total ion flux measured was insufficient to account for the observed deposition rate. The interface between thin films of a-C:H and silicon substrates was investigated using angle resolved x-ray photoelectron spectroscopy. A silicon carbide layer was detected at the interface of a hard a-C:H film formed at the powered electrode. At the grounded electrode, where the kinetic energy is low, no interfacial carbide layer was observed. Scanning tunneling microscopy and high energy electron energy loss spectroscopy was used to investigate the initial stages of growth of a-C:H films. On graphite substrates, films formed at the powered electrode were observed to nucleate in clusters approximately 50 {Angstrom} in diameter, while at the grounded electrode no cluster formation was observed. 58 figs.

  14. Friction properties of amorphous carbon ultrathin films deposited by filtered cathodic vacuum arc and radio-frequency sputtering

    International Nuclear Information System (INIS)

    The friction properties of ultrathin films of amorphous carbon (a-C) deposited on Si(100) substrates by filtered cathodic vacuum arc and radio-frequency sputtering were investigated by surface force microscopy. Deposition parameters yielding a-C films with high sp3 content were used to deposit films of thickness between 5 and 35 nm. The coefficient of friction of both types of a-C films was measured with a 1-μm-radius conical diamond tip and normal loads in the range of 20–640 μN. The results show a strong dependence of the friction properties on the surface roughness, thickness, and structure of the a-C films, which are influenced by the intricacies of the deposition method. The dependence of the coefficient of friction on normal load and the dominance of adhesion and plowing friction mechanisms are interpreted in terms of the through-thickness variation of carbon atom hybridization of the a-C films. - Highlights: • Comparison of nanoscale friction properties of ultrathin amorphous carbon films. • Friction dependence on film roughness, thickness, and structure (hybridization). • Effect of through-thickness changes in carbon atom hybridization on film friction. • Explanation of film friction trends in terms of competing friction mechanisms

  15. Friction properties of amorphous carbon ultrathin films deposited by filtered cathodic vacuum arc and radio-frequency sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Matlak, J.; Komvopoulos, K., E-mail: kyriakos@me.berkeley.edu

    2015-03-31

    The friction properties of ultrathin films of amorphous carbon (a-C) deposited on Si(100) substrates by filtered cathodic vacuum arc and radio-frequency sputtering were investigated by surface force microscopy. Deposition parameters yielding a-C films with high sp{sup 3} content were used to deposit films of thickness between 5 and 35 nm. The coefficient of friction of both types of a-C films was measured with a 1-μm-radius conical diamond tip and normal loads in the range of 20–640 μN. The results show a strong dependence of the friction properties on the surface roughness, thickness, and structure of the a-C films, which are influenced by the intricacies of the deposition method. The dependence of the coefficient of friction on normal load and the dominance of adhesion and plowing friction mechanisms are interpreted in terms of the through-thickness variation of carbon atom hybridization of the a-C films. - Highlights: • Comparison of nanoscale friction properties of ultrathin amorphous carbon films. • Friction dependence on film roughness, thickness, and structure (hybridization). • Effect of through-thickness changes in carbon atom hybridization on film friction. • Explanation of film friction trends in terms of competing friction mechanisms.

  16. Electronic structure and conductivity of nanocomposite metal (Au,Ag,Cu,Mo)-containing amorphous carbon films

    Energy Technology Data Exchange (ETDEWEB)

    Endrino, Jose L.; Horwat, David; Gago, Raul; Andersson, Joakim; Liu, Y.S.; Guo, Jinghua; Anders, Andre

    2008-05-14

    In this work, we study the influence of the incorporation of different metals (Me = Au, Ag, Cu, Mo) on the electronic structure of amorphous carbon (a-C:Me) films. The films were produced at room temperature using a novel pulsed dual-cathode arc deposition technique. Compositional analysis was performed with secondary neutral mass spectroscopy whereas X-ray diffraction was used to identify the formation of metal nanoclusters in the carbon matrix. The metal content incorporated in the nanocomposite films induces a drastic increase in the conductivity, in parallel with a decrease in the band gap corrected from Urbach energy. The electronic structure as a function of the Me content has been monitored by x-ray absorption near edge structure (XANES) at the C K-edge. XANES showed that the C host matrix has a dominant graphitic character and that it is not affected significantly by the incorporation of metal impurities, except for the case of Mo, where the modifications in the lineshape spectra indicated the formation of a carbide phase. Subtle modifications of the spectral lineshape are discussed in terms of nanocomposite formation.

  17. Strength and Fracture Resistance of Amorphous Diamond-Like Carbon Films for MEMS

    Directory of Open Access Journals (Sweden)

    K. N. Jonnalagadda

    2009-01-01

    Full Text Available The mechanical strength and mixed mode I/II fracture toughness of hydrogen-free tetrahedral amorphous diamond-like carbon (ta-C films, grown by pulsed laser deposition, are discussed in connection to material flaws and its microstructure. The failure properties of ta-C were obtained from films with thicknesses 0.5–3 μm and specimen widths 10–20 μm. The smallest test samples with 10 μm gage section averaged a strength of 7.3 ± 1.2 GPa, while the strength of 20-μm specimens with thicknesses 0.5–3 μm varied between 2.2–5.7 GPa. The scaling of the mechanical strength with specimen thickness and dimensions was owed to deposition-induced surface flaws, and, only in the smallest specimens, RIE patterning generated specimen sidewall flaws. The mode I fracture toughness of ta-C films is KIc=4.4±0.4 MPam, while the results from mixed mode I/II fracture experiments with cracks arbitrarily oriented in the plane of the film compared very well with theoretical predictions.

  18. Amorphous iron (II) carbonate

    DEFF Research Database (Denmark)

    Sel, Ozlem; Radha, A.V.; Dideriksen, Knud;

    2012-01-01

    Abstract The synthesis, characterization and crystallization energetics of amorphous iron (II) carbonate (AFC) are reported. AFC may form as a precursor for siderite (FeCO3). The enthalpy of crystallization (DHcrys) of AFC is similar to that of amorphous magnesium carbonate (AMC) and more...

  19. The effect of substrate bias on titanium carbide/amorphous carbon nanocomposite films deposited by filtered cathodic vacuum arc

    International Nuclear Information System (INIS)

    The titanium carbide/amorphous carbon nanocomposite films have been deposited on silicon substrate by filtered cathodic vacuum arc (FCVA) technology, the effects of substrate bias on composition, structures and mechanical properties of the films are studied by scanning electron spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy and nano-indentation. The results show that the Ti content, deposition rate and hardness at first increase and then decrease with increasing the substrate bias. Maximum hardness of the titanium carbide/amorphous carbon nanocomposite film is 51 Gpa prepared at −400 V. The hardness enhancement may be attributed to the compressive stress and the fraction of crystalline TiC phase due to ion bombardment

  20. An Effective Method for Improvement of Field Electron Emission Site Density and Uniformity of Amorphous Carbon Thin Films

    Institute of Scientific and Technical Information of China (English)

    WANG Xiao-Ping; WANG Li-Jun; ZHANG Bing-Lin; YAO Ning; ZANG Qi-Ren; CHEN Jun; DUAN Xin-Chao

    2006-01-01

    @@ Amorphous carbon films are deposited on the Mo film/ceramic substrates, which are pretreated by a laser spat-tering chiselling technique (2 line/mm), by using the microwave chemical vapour deposition technique. The films are characterized by x-ray diffraction, Raman spectrum, optical microscopy, and scanning electron microscopy.The experimental result indicates that the laser spattering chiselling pretreated techniques can essentially improve the field emission uniformity and the emission site density of the amorphous carbon thin film devices so that its emission site density can reach the level of actual application (undistinguishable by naked eye) from a broad well-proportioned emission area of 50mm × 50mm. This kind of device can show various digits and words clearly. The lowest turn-on field below 1 V/m, the emission current density over 5.0 ±0.1 mA/cm2, and the highest luminance 1.0 × 103 cd/m2 are obtained. Meanwhile, the role of the laser spattering chiselling techniques in improving the field emission properties of the amorphous carbon film are explained.

  1. Breakthrough curves of oil adsorption on novel amorphous carbon thin film.

    Science.gov (United States)

    El-Sayed, M; Ramzi, M; Hosny, R; Fathy, M; Abdel Moghny, Th

    2016-01-01

    A novel amorphous carbon thin film (ACTF) was prepared by hydrolyzing wood sawdust and delignificating the residue to obtain cellulose mass that was subjected to react with cobalt silicate nanoparticle as a catalyst under the influence of sudden concentrated sulfuric acid addition at 23 °C. The novel ACTF was obtained in the form of thin films like graphene sheets having winding surface. The prepared ACTF was characterized by Fourier-transform infrared spectrometer, transmission electron microscope (TEM), and Brunauer-Emmett-Teller (BET). The adsorption capacity of ACTF to remove oil from synthetic produced water was evaluated using the incorporation of Thomas and Yoon-Nelson models. The performance study is described through the breakthrough curves concept under relevant operating conditions such as column bed heights (3.8, 5 and 11 mm) and flow rate (0.5, 1 and 1.5 mL.min(-1)). It was found that the oil uptake mechanism is favoring higher bed height. Also, the highest bed capacity of 700 mg oil/g ACTF was achieved at 5 mm bed height, and 0.5 mL.min(-1) flow rate. The results of breakthrough curve for oil adsorption was best described using the Yoon-Nelson model. Finally, the results illustrate that ACTF could be utilized effectively for oil removal from synthetic produced water in a fixed-bed column system. PMID:27191556

  2. THE IMPROVEMENT OF ELECTRON FIELD EMISSION FROM AMORPHOUS CARBON FILMS DUE TO HYDROGEN PLASMA CHEMICAL ANNEALING EFFECT

    Institute of Scientific and Technical Information of China (English)

    J. Xu; X.H. Huang; L. Wang; W. Li; K.J. Chen; J.B. Xu

    2001-01-01

    Hydrogenated amorphous carbon films were fabricated by using layer-by-layer deposi-tion method and hydrogen dilution method in a small d.c.-assisted plasma enhancedchemical vapor deposition system. It was found that the hydrogen plasma treatmentcould change the sp2/sp3 ratio to some extent by chemical etching. The improvementsof field emission characteristics were observed compared with that from conventionallydeposited a-C films, which can be attributed to the large field enhancement effect dueto the inhomogeneous distribution of nanometer scale sp2 clusters and the reductionof the surface emission barrier due to the hydrogen termination.

  3. Hard coating of ultrananocrystalline diamond/nonhydrogenated amorphous carbon composite films on cemented tungsten carbide by coaxial arc plasma deposition

    Science.gov (United States)

    Naragino, Hiroshi; Egiza, Mohamed; Tominaga, Aki; Murasawa, Koki; Gonda, Hidenobu; Sakurai, Masatoshi; Yoshitake, Tsuyoshi

    2016-08-01

    Ultrananocrystalline diamond (UNCD)/nonhydrogenated amorphous carbon (a-C) composite (UNCD/a-C) films were deposited on cemented carbide containing Co by coaxial arc plasma deposition. With decreasing substrate temperature, the hardness was enhanced accompanied by an enhancement in the sp3/(sp2 + sp3). Energy-dispersive X-ray and secondary ion mass spectrometry spectroscopic measurements exhibited that the diffusion of Co atoms from the substrates into the films hardly occurs. The film deposited at room temperature exhibited the maximum hardness of 51.3 GPa and Young's modulus of 520.2 GPa, which evidently indicates that graphitization induced by Co in the WC substrates, and thermal deformation from sp3 to sp2 bonding are suppressed. The hard UNCD/a-C films can be deposited at a thickness of approximately 3 μm, which is an order larger than that of comparably hard a-C films. The internal compressive stress of the 51.3-GPa film is 4.5 GPa, which is evidently smaller than that of comparably hard a-C films. This is a reason for the thick deposition. The presence of a large number of grain boundaries in the film, which is a structural specific to UNCD/a-C films, might play a role in releasing the internal stress of the films.

  4. Mechanical properties of amorphous hydrogenated carbon films fabricated on polyethylene terephthalate foils by plasma immersion ion implantation and deposition

    International Nuclear Information System (INIS)

    Amorphous hydrogenated carbon (a-C:H) films have been deposited on polyethylene terephthalate by plasma immersion ion implantation and deposition. The influence of deposition parameters such as gas pressure, bias voltage, and nitrogen incorporation on the mechanical properties of the a-C:H films are investigated. X-ray photoelectron spectroscopy reveals that the ratio of sp3 to sp2 is 0.24 indicating that the film is mainly composed of graphitelike carbon. Nanoindentation tests disclose enhanced surface hardness of ∼6 GPa. The friction coefficient of the film deposited at higher gas pressure, for instance, 2.0 Pa, is lower than that of the film deposited at a lower pressure such as 0.5 Pa. The films deposited using a low bias voltage tend to fail easily in the friction tests and nitrogen incorporation into the a-C:H films decreases the friction coefficient. Mechanical folding tests show that deformation failure is worse on a thinner a-C:H film

  5. Amorphous carbon for photovoltaics

    Science.gov (United States)

    Risplendi, Francesca; Grossman, Jeffrey C.

    2015-03-01

    All-carbon solar cells have attracted attention as candidates for innovative photovoltaic devices. Carbon-based materials such as graphene, carbon nanotubes (CNT) and amorphous carbon (aC) have the potential to present physical properties comparable to those of silicon-based materials with advantages such as low cost and higher thermal stability.In particular a-C structures are promising systems in which both sp2 and sp3 hybridization coordination are present in different proportions depending on the specific density, providing the possibility of tuning their optoelectronic properties and achieving comparable sunlight absorption to aSi. In this work we employ density functional theory to design suitable device architectures, such as bulk heterojunctions (BHJ) or pn junctions, consisting of a-C as the active layer material.Regarding BHJ, we study interfaces between aC and C nanostructures (such as CNT and fullerene) to relate their optoelectronic properties to the stoichiometry of aC. We demonstrate that the energy alignment between the a-C mobility edges and the occupied and unoccupied states of the CNT or C60 can be widely tuned by varying the aC density to obtain a type II interface.To employ aC in pn junctions we analyze the p- and n-type doping of a-C focusingon an evaluation of the Fermi level and work function dependence on doping.Our results highlight promising features of aC as the active layer material of thin-film solar cells.

  6. Gas barrier properties of hydrogenated amorphous carbon films coated on polymers by surface-wave plasma chemical vapor deposition

    International Nuclear Information System (INIS)

    Gas barrier characteristics of hydrogenated amorphous carbon (a-C:H) thin films coated on polymer sheets using the large-area surface-wave plasma (SWP) were studied. With SWP in He and CH4 gas mixture, a-C:H films were deposited over about 100 mm in diameter on high density polyethylene or polyethylene terephthalate (PET) sheets at temperature less than 70 deg. C. Experimental results show that gas permeation in the case of a-C:H film coating on PET sheet was reduced by a factor of more than 150 (0.27 cm3/m2 day atm), compared with that before coating. Plasma characteristics of SWP, such as electron density and electron energy distribution functions, and other film characteristics measured with Fourier-transform infrared spectroscopy, X-ray photoelectron spectroscopy and atomic force microscope are presented and discussed

  7. Swift heavy ion irradiation of metal containing tetrahedral amorphous carbon films

    Science.gov (United States)

    Karaseov, P. A.; Protopopova, V. S.; Karabeshkin, K. V.; Shubina, E. N.; Mishin, M. V.; Koskinen, J.; Mohapatra, S.; Tripathi, A.; Avasthi, D. K.; Titov, A. I.

    2016-07-01

    Thin carbon films were grown at room temperature on (0 0 1) n-Si substrate using dual cathode filtered vacuum arc deposition system. Graphite was used as a source of carbon atoms and separate metallic electrode was simultaneously utilized to introduce Ni or Cu atoms. Films were irradiated by 100 MeV Ag7+ ions to fluences in the range 1 × 1010-3 × 1011 cm-2. Rutherford backscattering spectroscopy, Raman scattering, scanning electron microscopy and atomic force microscopy in conductive mode were used to investigate film properties and structure change under irradiation. Some conductive channels having metallic conductivity type were found in the films. Number of such channels is less than number of impinged ions. Presence of Ni and Cu atoms increases conductivity of those conductive channels. Fluence dependence of all properties studied suggests different mechanisms of swift heavy ion irradiation-induced transformation of carbon matrix due to different chemical effect of nickel and copper atoms.

  8. Structural and band tail state photoluminescence properties of amorphous SiC films with different amounts of carbon

    Institute of Scientific and Technical Information of China (English)

    Fu Guang-Sheng; Wang Xin-Zhan; Lu Wan-Bing; Dai Wan-Le; Li Xing-Kuo; Yu Wei

    2012-01-01

    Amorphous silicon carbide films are deposited by the plasma enhanced chemical vapour deposition technique,and optical emissions from the near-infrared to the visible are obtained.The optical band gap of the films increases from 1.91 eV to 2.92 eV by increasing the carbon content,and the photoluminescence (PL) peak shifts from 1.51 eV to 2.16 eV.The band tail state PL mechanism is confirmed by analysing the optical band gap,PL intensity,the Stocks shift of the PL,and the Urbach energy of the film.The PL decay times of the samples are in the nanosecond scale,and the dependence of the PL lifetime on the emission energy also supports that the optical emission is related to the radiative recombination in the band tail state.

  9. Structural and Physical Characteristics of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films Deposited Using a Coaxial Arc Plasma Gun

    Science.gov (United States)

    Yoshitake, Tsuyoshi; Nakagawa, You; Nagano, Akira; Ohtani, Ryota; Setoyama, Hiroyuki; Kobayashi, Eiichi; Sumitani, Kazushi; Agawa, Yoshiaki; Nagayama, Kunihito

    2010-01-01

    Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) films were formed without initial nucleation using a coaxial arc plasma gun. The UNCD crystallite diameters estimated from the X-ray diffraction peaks were approximately 2 nm. The Fourier transform infrared absorption spectrum exhibited an intense sp3-CH peak that might originate from the grain boundaries between UNCD crystallites whose dangling bonds are terminated with hydrogen atoms. A narrow sp3 peak in the photoemission spectrum implied that the film comprises a large number of UNCD crystallites. Large optical absorption coefficients at photon energies larger than 3 eV that might be due to the grain boundaries are specific to the UNCD/a-C:H films.

  10. Removal of a hydrogenated amorphous carbon film from the tip of a micropipette electrode using direct current corona discharge.

    Science.gov (United States)

    Kakuta, Naoto; Okuyama, Naoki; Yamada, Yukio

    2010-02-01

    Micropipette electrodes are fabricated by coating glass micropipettes first with metal and then with hydrogenated amorphous carbon (a-C:H) as an electrical insulator. Furthermore, at the tip of the micropipette electrode, the deposited a-C:H film needs to be removed to expose the metal-coated surface and hollow for the purposes of electrical measurement and injection. This paper describes a convenient and reliable method for removing the a-C:H film using direct current corona discharge in atmospheric air. The initial film removal occurred at an applied voltage of 1.5-2.0 kV, accompanied by an abrupt increase in the discharge current. The discharge current then became stable at a microampere level in the glow corona mode, and the removed area gradually extended. PMID:20192514

  11. Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power

    Energy Technology Data Exchange (ETDEWEB)

    Rashid, Nur Maisarah Abdul, E-mail: nurmaisarahrashid@gmail.com [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ritikos, Richard; Othman, Maisara; Khanis, Noor Hamizah; Gani, Siti Meriam Ab. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Muhamad, Muhamad Rasat [Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Rahman, Saadah Abdul, E-mail: saadah@um.edu.my [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, 50603 Kuala Lumpur (Malaysia); Chancellery Office, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2013-02-01

    Silicon carbon films were deposited using a hybrid radio frequency (r.f.) plasma enhanced chemical vapor deposition (PECVD)/sputtering deposition system at different r.f. powers. This deposition system combines the advantages of r.f. PECVD and sputtering techniques for the deposition of silicon carbon films with the added advantage of eliminating the use of highly toxic silane gas in the deposition process. Silicon (Si) atoms were sputtered from a pure amorphous silicon (a-Si) target by argon (Ar) ions and carbon (C) atoms were incorporated into the film from C based growth radicals generated through the discharge of methane (CH{sub 4}) gas. The effects of r.f. powers of 60, 80, 100, 120 and 150 W applied during the deposition process on the structural and optical properties of the films were investigated. Raman spectroscopic studies showed that the silicon carbon films contain amorphous silicon carbide (SiC) and amorphous carbon (a-C) phases. The r.f. power showed significant influence on the C incorporation in the film structure. The a-C phases became more ordered in films with high C incorporation in the film structure. These films also produced high photoluminescence emission intensity at around 600 nm wavelength as a result of quantum confinement effects from the presence of sp{sup 2} C clusters embedded in the a-SiC and a-C phases in the films. - Highlights: ► Effects of radio frequency (r.f.) power on silicon carbon (SiC) films were studied. ► Hybrid plasma enhanced chemical vapor deposition/sputtering technique was used. ► r.f. power influences C incorporation in the film structure. ► High C incorporation results in higher ordering of the amorphous C phase. ► These films produced high photoluminescence emission intensity.

  12. Effect of substrate bias in nitrogen incorporated amorphous carbon films with embedded nanoparticles deposited by filtered cathodic jet carbon arc technique

    Energy Technology Data Exchange (ETDEWEB)

    Panwar, O.S., E-mail: ospanwar@mail.nplindia.ernet.in [Amorphous and Microcrystalline Silicon Solar Cell Group, Physics of Energy Harvesting Division, National Physical Laboratory (C.S.I.R.), Dr. K.S. Krishnan Road, New Delhi-110012 (India); Kumar, Sushil; Ishpal,; Srivastava, A.K.; Chouksey, Abhilasha; Tripathi, R.K.; Basu, A. [Amorphous and Microcrystalline Silicon Solar Cell Group, Physics of Energy Harvesting Division, National Physical Laboratory (C.S.I.R.), Dr. K.S. Krishnan Road, New Delhi-110012 (India)

    2012-02-15

    Highlights: Black-Right-Pointing-Pointer a-C: N films having nanoparticles were deposited by filtered cathodic jet carbon arc (FCJCA) technique. Black-Right-Pointing-Pointer The effect of negative substrate bias on the properties of a-C: N films embedded with nanoparticles have been studied. Black-Right-Pointing-Pointer The properties of a-C: N films deposited by FCJCA technique have been compared with ta-C: N films deposited by FCVA process. - Abstract: The properties of nitrogen incorporated amorphous carbon (a-C: N) films with embedded nanoparticles, deposited using a filtered cathodic jet carbon arc technique, are reported. X-ray diffraction, high resolution transmission electron microscope and Raman spectroscopy measurements reveal an amorphous structure, but on closer examination the presence of clusters of nanocarbon single crystals with d-spacing close to diamond cubic-phase have also been identified. The effect of substrate bias on the microstructure, conductivity, activation energy, optical band gap, optical constants, residual stress, hardness, elastic modulus, plastic index parameter, percentage elastic recovery and density of states of a-C: N films have been studied and the properties obtained are found to depend on the substrate bias.

  13. Deposition and field-emission characterization of electrically conductive nitrogen-doped diamond-like amorphous carbon films

    International Nuclear Information System (INIS)

    For the fabrication of high performance field emitters, diamond-like amorphous carbon films doped with nitrogen (DAC:N) were formed using an intermittent supermagnetron plasma chemical vapor deposition technique. DAC:N films were deposited using isobutane plasma to investigate the influence of discharge-off time and electrode spacing on the physical properties of the films at upper- and lower-electrode radio frequency (rf) powers (LORF) of 800 W/50-800 W. At LORF of 100 W, a discharge-on time of 1 min, and a discharge-off time (cooling time) of 30 s-10 min, resistivity was decreased with a decrease of the cooling time. By reducing the electrode spacing from 60 to 20 mm at a LORF of 50 and 800 W, the optical band gap of DAC:N film was decreased from 0.85 and 0.23 eV to 0.6 and 0 eV, respectively. A flat DAC:N film of 700 A thickness was deposited on a n-Si wafer at rf powers of 800 W/800 W. Using this flat DAC:N film, a threshold electric field of 18 V/μm was observed and maximum field-emission current density of 2.2 mA/cm2 was observed at the electric field of 32 V/μm

  14. Studies of pure and nitrogen-incorporated hydrogenated amorphous carbon thin films and their possible application for amorphous silicon solar cells

    International Nuclear Information System (INIS)

    Hydrogenated amorphous carbon (a-C:H) and nitrogen-incorporated a-C:H (a-C:N:H) thin films were deposited using radio frequency-plasma-enhanced chemical vapor deposition technique and studied for their electrical, optical, and nano-mechanical properties. Introduction of nitrogen and increase of self bias enhanced the conductivity of a-C:H and a-C:N:H films, whereas current-voltage measurement reveals heterojunction formation due to their rectifying behavior. The bandgap of these films was changed over wide range from 1.9 eV to 3.45 eV by varying self bias and the nitrogen incorporation. Further, activation energy was correlated with the electronic structure of a-C:H and a-C:N:H films, and conductivity was discussed as a function of bandgap. Moreover, a-C:N:H films exhibited high hardness and elastic modulus, with maximum values as 42 GPa and 430 GPa, respectively, at -100 V. Observed fascinating electrical, optical, and nano-mechanical properties made it a material of great utility in the development of optoelectronic devices, such as solar cells. In addition, we also performed simulation study for an a-Si:H solar cell, considering a-C:H and C:N:H as window layers, and compared their performance with the a-Si:H solar cell having a-SiC:H as window layer. We also proposed several structures for the development of a near full-spectrum solar cell. Moreover, due to high hardness, a-C:N:H films can be used as a protective and encapsulate layer on solar cells, especially in n-i-p configuration on metal substrate. Nevertheless, a-C:H and a-C:N:H as a window layer can avoid the use of additional hard and protective coating and, hence, minimize the cost of the product.

  15. Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

    Science.gov (United States)

    Wang, Qi; Wang, Chengbing; Wang, Zhou; Zhang, Junyan; He, Deyan

    2008-12-01

    Hydrogenated amorphous carbon films were prepared on Si (1 0 0) substrates by dc-pulse plasma chemical vapor deposition. The nature of the deposited films was characterized by Raman spectra and the stress relief patterns were observed by scanning electron microscope. Besides the well-known sinusoidal type and flower type patterns, etc., two different stress relief patterns, ring type and peg-top shape with exiguous tine on the top, were observed. The ring type in this paper was a clear ridge-cracked buckle and unusual. Two competing buckle delamination morphologies ring and sinusoidal buckling coexist. The ridge-cracked buckle in ring type was narrower than the sinusoidal buckling. Meanwhile peg-top shape with exiguous tine on the top in this paper was unusual. These different patterns supported the approach in which the stress relief forms have been analyzed using the theory of plate buckling.

  16. Electron emission studies of CNTs grown on Ti and Ni containing amorphous carbon nanocomposite films

    International Nuclear Information System (INIS)

    Carbon nanotubes (CNTs) were grown successfully on the as-deposited dual metal (Ti and Ni) embedded films using a radio frequency plasma-enhanced chemical vapor deposition system. The microstructure of CNTs grown on the dual metal films proved to be heavily dependent on the percentages of metals included, varying both in size and in density. Electron emission tests carried out on the films with CNTs grown showed that the threshold field was dependent on the surface morphology of the CNTs, with the lowest threshold field at 3.5 V/μm from 2.5% Ti/Ni film with CNTs. The field enhancement factor, β, of the emitting tips was also calculated from the Fowler-Nordheim plots, where CNTs from the 2.5% Ti/Ni film gave the highest field enhancement factor. However, it was observed that films with a single metal of either Ti or Ni did not manage to grow CNTs, possibly due to a lack of catalyst centres at the surface of the films. It was believed that the Ni nanoclusters acted as catalysts centres giving a rather uniform but randomly orientated type of CNTs. Results obtained pointed that the fabricated nanocomposite material could be a possible choice for cold cathode emitters and the Ti/Ni mixture could be an effective composite for controlling the CNT density.

  17. Raman shift on n-doped amorphous carbon thin films grown by electron beam evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Rebollo P., B. [Departamento de Fisica, Pontificia Universidad Catolica de Rio de Janeiro (Brazil); Facultad de Ciencias Fisico-Matematicas, Benemerita Universidad Autonoma de Puebla (Mexico); Freire L., F. Jr. [Departamento de Fisica, Pontificia Universidad Catolica de Rio de Janeiro (Brazil); Lozada M., R.; Palomino M., R. [Facultad de Ciencias Fisico-Matematicas, Benemerita Universidad Autonoma de Puebla (Mexico); Jimenez S., S. [Centro de Investigacion y de Estudios Avanzados del IPN, Laboratorio de Investigacion en Materiales, Queretaro (Mexico); Zelaya A., O. [Centro de Investigacion y de Estudios Avanzados del IPN, Departamento de Fisica, CINVESTAV-IPN, P.O. Box 14-740, Mexico 07360 D.F. (Mexico)

    2007-04-15

    The structural properties of carbon thin films synthesized under an atmosphere of nitrogen by means of electron beam evaporation were studied by Raman scattering spectroscopy. The electron beam evaporation technique is an important alternative to grown layers of this material with interesting structural properties. The observed shift of the Raman G band shows that the structure of the films tends to become more graphitic upon the increase of the deposition time. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  18. Incidence Angle Effect of Energetic Carbon Ions on Deposition Rate, Topography, and Structure of Ultrathin Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc

    KAUST Repository

    Wang, N.

    2012-07-01

    The effect of the incidence angle of energetic carbon ions on the thickness, topography, and structure of ultrathin amorphous carbon (a-C) films synthesized by filtered cathodic vacuum arc (FCVA) was examined in the context of numerical and experimental results. The thickness of a-C films deposited at different incidence angles was investigated in the light of Monte Carlo simulations, and the calculated depth profiles were compared with those obtained from high-resolution transmission electron microscopy (TEM). The topography and structure of the a-C films were studied by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The film thickness decreased with the increase of the incidence angle, while the surface roughness increased and the content of tetrahedral carbon hybridization (sp 3) decreased significantly with the increase of the incidence angle above 45° , measured from the surface normal. TEM, AFM, and XPS results indicate that the smoothest and thinnest a-C films with the highest content of sp 3 carbon bonding were produced for an incidence angle of 45°. The findings of this study have direct implications in ultrahigh-density magnetic recording, where ultrathin and smooth a-C films with high sp 3 contents are of critical importance. © 2012 IEEE.

  19. Physical properties of ultrafast deposited micro- and nanothickness amorphous hydrogenated carbon films for medical devices and prostheses.

    Science.gov (United States)

    Zaharia, T; Sullivan, I L; Saied, S O; Bosch, R C; Bijker, M D

    2007-02-01

    Hydrogenated amorphous carbon films with diamond-like structures have been formed on different substrates at very low energies and temperatures by a plasma-enhanced chemical vapour deposition (PECVD) process employing acetylene as the precursor gas. The plasma source was of a cascaded arc type with argon as the carrier gas. The films grown at very high deposition rates were found to have a practical thickness limit of approximately 1.5 microm, above which delamination from the substrate occurred. Deposition on silicon (100), glass, and plastic substrates has been studied and the films characterized in terms of sp3 content, roughness, hardness, adhesion, and optical properties. Deposition rates of up to 20 nm/s have been achieved at substrate temperatures below 100 degrees C. A typical sp3 content of 60-75 per cent in the films was determined by X-ray-generated Auger electron spectroscopy (XAES). The hardness, reduced modulus, and adhesion of the films were measured using a MicroMaterials NanoTest indenter/scratch tester. Hardness was found to vary from 4 to 13 GPa depending on the admixed acetylene flow and substrate temperature. The adhesion of the film to the substrate was significantly influenced by the substrate temperature and whether an in situ d.c. cleaning was employed prior to the deposition process. The hydrogen content in the film was measured by a combination of the Fourier transformation infrared (FTIR) spectroscopy and Rutherford backscattering (RBS) techniques. From the results it is concluded that the films formed by the process described here are ideal for the coating of long-term implantable medical devices, such as prostheses, stents, invasive probes, catheters, biosensors, etc. The properties reported in this publication are comparable with good-quality films deposited by other PECVD methods. The advantages of these films are the low ion energy and temperature of deposition, ensuring that no damage is done to sensitive substrates, very high

  20. Influence of Increasing Deposition Temperature on Electrical Properties of Amorphous Carbon Thin Film Prepared by Aerosol-Assisted Thermal CVD

    International Nuclear Information System (INIS)

    This paper reports on the successful deposition of p-type semiconducting amorphous carbon (paC) films fabricated onto the glass substrate by Aerosol-Assisted Thermal Chemical Vapor Deposition (CVD) using natural source of camphor oil as the precursor material. The analyze reveal that conductivity and resistivity shows some changes at different deposition temperature, that is the conductivity increase as temperature increase from 350 to 550 degree Celsius, but drop slightly at 550 degree Celsius. Other than that, optical and structural properties were also characterized by using UV-VIS-NIR system and Atomic Force Microscopy. The same trend of optical and electrical can be seen when the measurement from the Taucs plot expose a decreasing value of optical band gap as temperature increase, but slightly increase when temperature increase to 550 degree Celsius. (author)

  1. Physical properties of nitrogen-doped diamond-like amorphous carbon films deposited by supermagnetron plasma chemical vapor deposition

    International Nuclear Information System (INIS)

    Diamond-like amorphous carbon films doped with nitrogen (DAC:N) were deposited on Si and glass wafers intermittently using i-C4H10/N2 repetitive supermagnetron plasma chemical vapor deposition. Deposition duration, which is equal to a plasma heating time of wafer, was selected to be 40 or 60 s, and several layers were deposited repetitively to form one thick film. DAC:N films were deposited at a lower-electrode temperature of 100 deg. C as a function of upper- and lower-electrode rf powers (200 W/200 W-1 kW/1 kW) and N2 concentration (0%-80%). With an increase in N2 concentration and rf power, the resistivity and the optical band gap decreased monotonously. With increase of the deposition duration from 40 to 60 s, resistivity decreased to 0.03Ω cm and optical band gap decreased to 0.02 eV (substantially equal to 0 eV within the range of experimental error), at an N2 concentration of 80% and rf power of 1 kW(/1 kW)

  2. Deposit of thin films of nitrided amorphous carbon using the laser ablation technique; Deposito de peliculas delgadas de carbono amorfo nitrurado utilizando la tecnica de ablacion laser

    Energy Technology Data Exchange (ETDEWEB)

    Rebollo, P.B.; Escobar A, L.; Camps C, E. [Departamento de Fisica, Instituto Nacional de Investigaciones Nucleares, C.P. 52045 Salazar, Estado de Mexico (Mexico); Haro P, E.; Camacho L, M.A. [Departamento de Fisica, Universidad Autonoma Metropolitana Iztapalapa (Mexico); Muhl S, S. [Instituto de Investigacion en Materiales, UNAM (Mexico)

    2000-07-01

    It is reported the synthesis and characterization of thin films of amorphous carbon (a-C) nitrided, deposited by laser ablation in a nitrogen atmosphere at pressures which are from 4.5 x 10 {sup -4} Torr until 7.5 x 10 {sup -2} Torr. The structural properties of the films are studied by Raman spectroscopy obtaining similar spectra at the reported for carbon films type diamond. The study of behavior of the energy gap and the ratio nitrogen/carbon (N/C) in the films, shows that the energy gap is reduced when the nitrogen incorporation is increased. It is showed that the refraction index of the thin films diminish as nitrogen pressure is increased, indicating the formation of graphitic material. (Author)

  3. Influence of Fe-doped on structural, electronic structural and optical properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    Fe-doped hydrogenated amorphous carbon (a-C:H:Fe) films were deposited from an isobutene/ferrocene/H2 gas mixture by plasma enhanced chemical metal organic vapor deposition. Raman spectra were used to characterize the bonding structure of the a-C:H:Fe films and hydrogenated amorphous carbon (a-C:H) films. Optical properties were investigated by the UV-vis spectroscopy and the photoluminescence spectra. The number of six-numbered rings of the a-C:H films increases and sp2 clustering of the films decreases after Fe-doping. The Tauc optical gap of the a-C:H:Fe films becomes narrower by 0.15-0.23 eV relative to the value of the a-C:H films. The narrowing of the optical gap after doping is attributed primarily to the extended state around the Fe deep level in the band gap and the narrowing of the π and π* band edge states because of the increase of the number of six-numbered rings in the a-C:H films. Fe deep level defects of the a-C:H:Fe films contribute chiefly to non-radiative recombination.

  4. Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD

    Directory of Open Access Journals (Sweden)

    Hui-Lin Hsu

    2014-02-01

    Full Text Available The integration of photonic materials into CMOS processing involves the use of new materials. A simple one-step metal-organic radio frequency plasma enhanced chemical vapor deposition system (RF-PEMOCVD was deployed to grow erbium-doped amorphous carbon thin films (a-C:(Er on Si substrates at low temperatures (<200 °C. A partially fluorinated metal-organic compound, tris(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5- octanedionate Erbium(+III or abbreviated Er(fod3, was incorporated in situ into a-C based host. Six-fold enhancement of Er room-temperature photoluminescence at 1.54 µm was demonstrated by deuteration of the a-C host. Furthermore, the effect of RF power and substrate temperature on the photoluminescence of a-C:D(Er films was investigated and analyzed in terms of the film structure. Photoluminescence signal increases with increasing RF power, which is the result of an increase in [O]/[Er] ratio and the respective erbium-oxygen coordination number. Moreover, photoluminescence intensity decreases with increasing substrate temperature, which is attributed to an increased desorption rate or a lower sticking coefficient of the fluorinated fragments during film growth and hence [Er] decreases. In addition, it is observed that Er concentration quenching begins at ~2.2 at% and continues to increase until 5.5 at% in the studied a-C:D(Er matrix. This technique provides the capability of doping Er in a vertically uniform profile.

  5. Time-Resolved Observation of Deposition Process of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films in Pulsed Laser Deposition

    Directory of Open Access Journals (Sweden)

    Kenji Hanada

    2009-01-01

    Full Text Available Optical emission spectroscopy was used to study pulsed laser ablation of graphite in a hydrogen atmosphere wherein ultrananocrystalline diamond (UNCD/hydrogenated amorphous carbon (a-C:H composite films were grown on heated substrates. Time-resolved photographs of a plume that expanded from a laser-irradiation spot toward a substrate were taken using a high-speed ICCD camera equipped with narrow-bandpass filters. While the emissions from C atoms and C2 dimers lasted above the laser-irradiation spot on the target, the emission from C+ ions lasted above the substrate surface for approximately 7 microseconds, although the emission lifetime of species is generally approximately 10 nanoseconds. This implies that C+ ions actively collided with each other above the substrate surface for such a long time. We believe that the keys to UNCD growth in PLD are the supply of highly energetic carbon species at a high density to the substrate and existence of atomic hydrogen during the growth.

  6. Room temperature photoluminescence from nanostructured amorphous carbon

    OpenAIRE

    Henley, SJ; Carey, JD; Silva, SRP

    2004-01-01

    Visible room-temperature photoluminescence (PL) was observed from hydrogen-free nanostructured amorphous carbon films deposited by pulsed laser ablation in different background pressures of argon (PAr). By varying PAr from 5 to 340 mTorr, the film morphology changed from smooth to rough and at the highest pressures, low-density filamentary growth was observed. Over the same pressure regime an increase in the ordering of sp2 bonded C content was observed using visible Raman spectroscopy. Th...

  7. Study of Synchrotron Radiation Near-Edge X-Ray Absorption Fine-Structure of Amorphous Hydrogenated Carbon Films at Various Thicknesses

    Directory of Open Access Journals (Sweden)

    Sarayut Tunmee

    2015-01-01

    Full Text Available The compositions and bonding states of the amorphous hydrogenated carbon films at various thicknesses were evaluated via near-edge X-ray absorption fine-structure (NEXAFS and elastic recoil detection analysis combined with Rutherford backscattering spectrometry. The absolute carbon sp2 contents were determined to decrease to 65% from 73%, while the hydrogen contents increase from 26 to 33 at.% as the film thickness increases. In addition, as the film thickness increases, the π⁎ (C=C, σ⁎ (C–H, σ⁎ (C=C, and σ⁎ (C≡C bonding states were found to increase, whereas the π⁎ (C≡C and σ⁎ (C–C bonding states were observed to decrease in the NEXAFS spectra. Consequently, the film thickness is a key factor to evaluate the composition and bonding state of the films.

  8. Control of carbon content in amorphous GeTe films deposited by plasma enhanced chemical vapor deposition (PE-MOCVD) for phase-change random access memory applications

    International Nuclear Information System (INIS)

    Amorphous and smooth GeTe thin films are deposited on 200 mm silicon substrates by plasma enhanced—metal organic chemical vapor deposition (PE–MOCVD) using the commercial organometallic precursors TDMAGe and DIPTe as Ge and Te precursors, respectively. X-ray photoelectron spectroscopy (XPS) measurements show a stoichiometric composition of the deposited GeTe films but with high carbon contamination. Using information collected by Optical Emission Spectroscopy (OES) and XPS, the origin of carbon contamination is determined and the dissociation mechanisms of Ge and Te precursors in H2 + Ar plasma are proposed. As a result, carbon level is properly controlled by varying operating parameters such as plasma radio frequency power, pressure and H2 rate. Finally, GeTe films with carbon level as low as 5 at. % are obtained. (paper)

  9. Synthesis and characterization of thin films of nitrided amorphous carbon deposited by laser ablation; Sintesis y caracterizacion de peliculas delgadas de carbono amorfo nitrurado, depositadas por ablacion laser

    Energy Technology Data Exchange (ETDEWEB)

    Rebollo P, B

    2001-07-01

    The objective of this work is the synthesis and characterization of thin films of amorphous carbon (a-C) and thin films of nitrided amorphous carbon (a-C-N) using the laser ablation technique for their deposit. For this purpose, the physical properties of the obtained films were studied as function of diverse parameters of deposit such as: nitrogen pressure, power density, substrate temperature and substrate-target distance. For the characterization of the properties of the deposited thin films the following techniques were used: a) Raman spectroscopy which has demonstrated being a sensitive technique to the sp{sup 2} and sp{sup 3} bonds content, b) Energy Dispersive Spectroscopy which allows to know semi-quantitatively way the presence of the elements which make up the deposited films, c) Spectrophotometry, for obtaining the absorption spectra and subsequently the optical energy gap of the deposited material, d) Ellipsometry for determining the refraction index, e) Scanning Electron Microscopy for studying the surface morphology of thin films and, f) Profilemetry, which allows the determination the thickness of the deposited thin films. (Author)

  10. Amorphous MoSx thin-film-coated carbon fiber paper as a 3D electrode for long cycle life symmetric supercapacitors

    Science.gov (United States)

    Balasingam, Suresh Kannan; Thirumurugan, Arun; Lee, Jae Sung; Jun, Yongseok

    2016-06-01

    Amorphous MoSx thin-film-coated carbon fiber paper as a binder-free 3D electrode was synthesized by a facile hydrothermal method. The maximum specific capacitance of a single electrode was 83.9 mF cm-2, while it was 41.9 mF cm-2 for the symmetric device. Up to 600% capacitance retention was observed for 4750 cycles.Amorphous MoSx thin-film-coated carbon fiber paper as a binder-free 3D electrode was synthesized by a facile hydrothermal method. The maximum specific capacitance of a single electrode was 83.9 mF cm-2, while it was 41.9 mF cm-2 for the symmetric device. Up to 600% capacitance retention was observed for 4750 cycles. Electronic supplementary information (ESI) available. See DOI: 10.1039/C6NR01200K

  11. Biological Characteristics of the MG-63 Human Osteosarcoma Cells on Composite Tantalum Carbide/Amorphous Carbon Films

    OpenAIRE

    Yin-Yu Chang; Heng-Li Huang; Ya-Chi Chen; Jui-Ting Hsu; Tzong-Ming Shieh; Ming-Tzu Tsai

    2014-01-01

    Tantalum (Ta) is a promising metal for biomedical implants or implant coating for orthopedic and dental applications because of its excellent corrosion resistance, fracture toughness, and biocompatibility. This study synthesizes biocompatible tantalum carbide (TaC) and TaC/amorphous carbon (a-C) coatings with different carbon contents by using a twin-gun magnetron sputtering system to improve their biological properties and explore potential surgical implant or device applications. The carbon...

  12. Gas barrier properties of hydrogenated amorphous carbon films coated on polyethylene terephthalate by plasma polymerization in argon/n-hexane gas mixture

    Energy Technology Data Exchange (ETDEWEB)

    Polonskyi, Oleksandr; Kylián, Ondřej, E-mail: ondrej.kylian@gmail.com; Petr, Martin; Choukourov, Andrei; Hanuš, Jan; Biederman, Hynek

    2013-07-01

    Hydrogenated amorphous carbon thin films were deposited by RF plasma polymerization in argon/n-hexane gas mixture on polyethylene terephthalate (PET) foils. It was found that such deposited films may significantly improve the barrier properties of PET. It was demonstrated that the principal parameter that influences barrier properties of such deposited films towards oxygen and water vapor is the density of the coatings. Moreover, it was shown that for achieving good barrier properties it is advantageous to deposit coatings with very low thickness. According to the presented results, optimal thickness of the coating should not be higher than several tens of nm. - Highlights: • a-C:H films were prepared by plasma polymerization in Ar/n-hexane atmosphere. • Barrier properties of coatings are dependent on their density and thickness. • Highest barrier properties were observed for films with thickness 15 nm.

  13. Gas barrier properties of hydrogenated amorphous carbon films coated on polyethylene terephthalate by plasma polymerization in argon/n-hexane gas mixture

    International Nuclear Information System (INIS)

    Hydrogenated amorphous carbon thin films were deposited by RF plasma polymerization in argon/n-hexane gas mixture on polyethylene terephthalate (PET) foils. It was found that such deposited films may significantly improve the barrier properties of PET. It was demonstrated that the principal parameter that influences barrier properties of such deposited films towards oxygen and water vapor is the density of the coatings. Moreover, it was shown that for achieving good barrier properties it is advantageous to deposit coatings with very low thickness. According to the presented results, optimal thickness of the coating should not be higher than several tens of nm. - Highlights: • a-C:H films were prepared by plasma polymerization in Ar/n-hexane atmosphere. • Barrier properties of coatings are dependent on their density and thickness. • Highest barrier properties were observed for films with thickness 15 nm

  14. Improved adhesion and tribological properties of fast-deposited hard graphite-like hydrogenated amorphous carbon films

    NARCIS (Netherlands)

    Zaharia, T.; Kudlacek, P.; Creatore, M.; Groenen, R.; Persoone, P.; M. C. M. van de Sanden,

    2011-01-01

    Graphite-like hard hydrogenated amorphous carbon (a-C:H) was deposited using an Ar-C(2)H(2) expanding thermal plasma chemical vapour deposition (ETP-CVD) process. The relatively high hardness of the fast deposited a-C:H material leads to high compressive stress resulting in poor adhesion between the

  15. Rapid Annealing Of Amorphous Hydrogenated Carbon

    Science.gov (United States)

    Alterovitz, Samuel A.; Pouch, John J.; Warner, Joseph D.

    1989-01-01

    Report describes experiments to determine effects of rapid annealing on films of amorphous hydrogenated carbon. Study represents first efforts to provide information for applications of a-C:H films where rapid thermal processing required. Major finding, annealing causes abrupt increase in absorption and concomitant decrease in optical band gap. Most of change occurs during first 20 s, continues during longer annealing times. Extend of change increases with annealing temperature. Researchers hypothesize abrupt initial change caused by loss of hydrogen, while gradual subsequent change due to polymerization of remaining carbon into crystallites or sheets of graphite. Optical band gaps of unannealed specimens on silicon substrates lower than those of specimens on quartz substrates.

  16. The effect of deposition energy of energetic atoms on the growth and structure of ultrathin amorphous carbon films studied by molecular dynamics simulations

    KAUST Repository

    Wang, N

    2014-05-16

    The growth and structure of ultrathin amorphous carbon films was investigated by molecular dynamics simulations. The second-generation reactive-empirical-bond-order potential was used to model atomic interactions. Films with different structures were simulated by varying the deposition energy of carbon atoms in the range of 1-120 eV. Intrinsic film characteristics (e.g. density and internal stress) were determined after the system reached equilibrium. Short- and intermediate-range carbon atom ordering is examined in the context of atomic hybridization and ring connectivity simulation results. It is shown that relatively high deposition energy (i.e., 80 eV) yields a multilayer film structure consisting of an intermixing layer, bulk film and surface layer, consistent with the classical subplantation model. The highest film density (3.3 g cm-3), sp3 fraction (∼43%), and intermediate-range carbon atom ordering correspond to a deposition energy of ∼80 eV, which is in good agreement with experimental findings. © 2014 IOP Publishing Ltd.

  17. Electron field emission from amorphous semiconductor thin films

    International Nuclear Information System (INIS)

    The flat panel display market requires new and improved technologies in order to keep up with the requirements of modem lifestyles. Electron field emission from thin film amorphous semiconductors is potentially such a technology. For this technology to become viable, improvements in the field emitting properties of these materials must be achieved. To this end, it is important that a better understanding of the emission mechanisms responsible is attained. Amorphous carbon thin films, amorphous silicon thin films and other materials have been deposited, in-house and externally. These materials have been characterised using ellipsometry, profilometry, optical absorption, scanning electron microscopy, atomic force microscopy, electron paramagnetic resonance and Rutherford backscattering spectroscopy. An experimental system for evaluating the electron field emitting performance of thin films has been developed. In the process of developing thin film cathodes in this study, it has been possible to add a new and potentially more useful semiconductor, namely amorphous silicon, to the family of cold cathode emitters. Extensive experimental field emission data from amorphous carbon thin films, amorphous silicon thin films and other materials has been gathered. This data has been used to determine the mechanisms responsible for the observed electron emission. Preliminary computer simulations using appropriate values for the different material properties have exhibited emission mechanisms similar to those identified by experiment. (author)

  18. Electrical properties of pulsed UV laser irradiated amorphous carbon

    OpenAIRE

    Y. Miyajima; Adikaari, AADT; Henley, SJ; Shannon, JM; Silva, SRP

    2008-01-01

    Amorphous carbon films containing no hydrogen were irradiated with a pulsed UV laser in vacuum. Raman spectroscopy indicates an increase in the quantity of sp(2) clustering with the highest laser energy density and a commensurate reduction in resistivity. The reduction of resistivity is explained to be associated with thermally induced graphitization of amorphous carbon films. The high field transport is consistent with a Poole-Frenkel type transport mechanism via neutral trapping centers rel...

  19. Endothelialization of TiO2 Nanorods Coated with Ultrathin Amorphous Carbon Films.

    Science.gov (United States)

    Chen, Hongpeng; Tang, Nan; Chen, Min; Chen, Dihu

    2016-12-01

    Carbon plasma nanocoatings with controlled fraction of sp(3)-C bonding were deposited on TiO2 nanorod arrays (TNAs) by DC magnetic-filtered cathodic vacuum arc deposition (FCVAD). The cytocompatibility of TNA/carbon nanocomposites was systematically investigated. Human umbilical vein endothelial cells (HUVECs) were cultured on the nanocomposites for 4, 24, and 72 h in vitro. It was found that plasma-treated TNAs exhibited excellent cell viability as compared to the untreated. Importantly, our results show that cellular responses positively correlate with the sp(3)-C content. The cells cultured on high sp(3)-C-contented substrates exhibit better attachment, shape configuration, and proliferation. These findings indicate that the nanocomposites with high sp(3)-C content possessed superior cytocompatibility. Notably, the nanocomposites drastically reduced platelet adhesion and activation in our previous studies. Taken together, these findings suggest the TNA/carbon scaffold may serve as a guide for the design of multi-functionality devices that promotes endothelialization and improves hemocompatibility. PMID:26979723

  20. Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Bakoglidis, Konstantinos D., E-mail: konba@ifm.liu.se; Schmidt, Susann; Garbrecht, Magnus; Ivanov, Ivan G.; Jensen, Jens; Greczynski, Grzegorz; Hultman, Lars [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)

    2015-09-15

    The potential of different magnetron sputtering techniques for the synthesis of low friction and wear resistant amorphous carbon nitride (a-CN{sub x}) thin films onto temperature-sensitive AISI52100 bearing steel, but also Si(001) substrates was studied. Hence, a substrate temperature of 150 °C was chosen for the film synthesis. The a-CN{sub x} films were deposited using mid-frequency magnetron sputtering (MFMS) with an MF bias voltage, high power impulse magnetron sputtering (HiPIMS) with a synchronized HiPIMS bias voltage, and direct current magnetron sputtering (DCMS) with a DC bias voltage. The films were deposited using a N{sub 2}/Ar flow ratio of 0.16 at the total pressure of 400 mPa. The negative bias voltage, V{sub s}, was varied from 20 to 120 V in each of the three deposition modes. The microstructure of the films was characterized by high-resolution transmission electron microscopy and selected area electron diffraction, while the film morphology was investigated by scanning electron microscopy. All films possessed an amorphous microstructure, while the film morphology changed with the bias voltage. Layers grown applying the lowest substrate bias of 20 V exhibited pronounced intercolumnar porosity, independent of the sputter technique. Voids closed and dense films are formed at V{sub s} ≥ 60 V, V{sub s} ≥ 100 V, and V{sub s} = 120 V for MFMS, DCMS, and HiPIMS, respectively. X-ray photoelectron spectroscopy revealed that the nitrogen-to-carbon ratio, N/C, of the films ranged between 0.2 and 0.24. Elastic recoil detection analysis showed that Ar content varied between 0 and 0.8 at. % and increased as a function of V{sub s} for all deposition techniques. All films exhibited compressive residual stress, σ, which depends on the growth method; HiPIMS produces the least stressed films with values ranging between −0.4 and −1.2 GPa for all V{sub s}, while CN{sub x} films deposited by MFMS showed residual stresses up to −4.2

  1. Structure, mechanical, and frictional properties of hydrogenated fullerene-like amorphous carbon film prepared by direct current plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Wang, Yongfu; Gao, Kaixiong; Zhang, Junyan

    2016-07-01

    In this study, fullerene like carbon (FL-C) is introduced in hydrogenated amorphous carbon (a-C:H) film by employing a direct current plasma enhanced chemical vapor deposition. The film has a low friction and wear, such as 0.011 and 2.3 × 10-9mm3/N m in the N2, and 0.014 and 8.4 × 10-8mm3/N m in the humid air, and high hardness and elasticity (25.8 GPa and 83.1%), to make further engineering applications in practice. It has several nanometers ordered domains consisting of less frequently cross-linked graphitic sheet stacks. We provide new evidences for understanding the reported Raman fit model involving four vibrational frequencies from five, six, and seven C-atom rings of FL-C structures, and discuss the structure evolution before or after friction according to the change in the 1200 cm-1 Raman band intensity caused by five- and seven-carbon rings. Friction inevitably facilitates the transformation of carbon into FL-C nanostructures, namely, the ultra low friction comes from both such structures within the carbon film and the sliding induced at friction interface.

  2. Heavy-ion induced desorption yields of amorphous carbon films bombarded with 4.2 MeV/u lead ions

    CERN Document Server

    Mahner, E; Küchler, D; Scrivens, R; Costa Pinto, P; Yin Vallgren, C; Bender, M

    2011-01-01

    During the past decade, intense experimental studies on the heavy-ion induced molecular desorption were performed in several particle accelerator laboratories worldwide in order to understand and overcome large dynamic pressure rises caused by lost beam ions. Different target materials and various coatings were studied for desorption and mitigation techniques were applied to heavy-ion accelerators. For the upgrade of the CERN injector complex, a coating of the Super Proton Synchrotron (SPS) vacuum system with a thin film of amorphous carbon is under study to mitigate the electron cloud effect observed during SPS operation with the nominal proton beam for the Large Hadron Collider (LHC). Since the SPS is also part of the heavy-ion injector chain for LHC, dynamic vacuum studies of amorphous carbon films are important to determine their ion induced desorption yields. At the CERN Heavy Ion Accelerator (LINAC 3), carbon-coated accelerator-type stainless steel vacuum chambers were tested for desorption using 4.2 Me...

  3. Film adhesion in amorphous silicon solar cells

    Indian Academy of Sciences (India)

    A R M Yusoff; M N Syahrul; K Henkel

    2007-08-01

    A major issue encountered during fabrication of triple junction -Si solar cells on polyimide substrates is the adhesion of the solar cell thin films to the substrates. Here, we present our study of film adhesion in amorphous silicon solar cells made on different polyimide substrates (Kapton VN, Upilex-S and Gouldflex), and the effect of tie coats on film adhesion.

  4. Hydrogenated amorphous carbon-nitride films deposited on Si(100) by direct-current saddle-field plasma-enhanced chemical-vapor deposition

    CERN Document Server

    Jang, H K; Lee, Y S; Whangbo, S W; Whang, C N; Yoo, Y Z; Kim, H G

    1999-01-01

    Hydrogenated amorphous carbon nitride [a-C:H(N)] films were deposited using dc saddle-field plasma-enhanced chemical-vapor deposition. The structural and the compositional changes induced in the films by the different flow-rate ratios of N sub 2 to CH sub 4 (n sub N sub 2 /n sub C sub H sub sub 4) were investigated using Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. The deposition rate of the films abruptly decreased upon increasing the n sub N sub 2 /n sub C sub H sub sub 4 ratio. However, for n sub N sub 2 /n sub C sub H sub sub 4 >0.5, the deposition rate slightly decreased with increasing n sub N sub 2 /n sub C sub H sub sub 4. The ratio of N to C (N/C) of the films saturated to 0.25 with increasing n sub N sub 2 /n sub C sub H sub sub 4. The numbers of N-H and C ident to N bonds in the films increased with increasing n sub N sub 2 /n sub C sub H sub sub 4 , but the number of C-H bonds decreased. The optical band-gap energy of the films decreased from 2.53 eV to 2.3 eV as t...

  5. Intermittent chemical vapor deposition of thick electrically conductive diamond-like amorphous carbon films using i-C4H10/N2 supermagnetron plasma

    International Nuclear Information System (INIS)

    Electrically conductive diamond-like amorphous carbon (DAC) films with nitrogen (DAC:N) were deposited on Si and SiO2 wafers using the i-C4H10/N2 supermagnetron plasma chemical vapor deposition (CVD) method. Resistivity and hardness decreased with increase of upper electrode rf power (UPRF) under constant lower electrode rf power (LORF). Film thickness increased linearly to over 0.3 μm with deposition time via intermittent deposition. The film exhibited good adhesion to the substrate. Low-resistance thick films were deposited using alternating multilayer CVD at UPRF/LORFs of 1 kW/1 kW and 300 W/300 W. In the deposited alternating multiple layers, resistivity significantly decreased with the increase of H layer (1 kW/1 kW) thickness, and film thickness significantly increased with the increase of L layer (300 W/300 W) thickness. By the deposition of H/L multiple layers, a film of 2.1 μm thickness and 0.14 Ω cm resistivity was obtained

  6. Hydrogenation effects on carrier transport in boron-doped ultrananocrystalline diamond/amorphous carbon films prepared by coaxial arc plasma deposition

    Energy Technology Data Exchange (ETDEWEB)

    Katamune, Yūki, E-mail: yuki-katamune@kyudai.jp; Takeichi, Satoshi [Department of Applied Science for Electronics and Materials, Kyushu University, 6-1 Kasuga, Fukuoka 816-8580 (Japan); Ohmagari, Shinya [Diamond Research Group, Research Institute for Ubiquitous Energy Devices (UBIQEN), National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577 (Japan); Yoshitake, Tsuyoshi, E-mail: tsuyoshi-yoshitake@kyudai.jp [Department of Applied Science for Electronics and Materials, Kyushu University, 6-1 Kasuga, Fukuoka 816-8580 (Japan); Research Center for Synchrotron Light Applications, Kyushu University, 6-1 Kasuga 816-8580 (Japan); Research and Education Center for Advanced Energy, Materials, Devices, and Systems, Kyushu University, 6-1 Kasuga 816-8580 (Japan)

    2015-11-15

    Boron-doped ultrananocrystalline diamond/hydrogenated amorphous carbon composite (UNCD/a-C:H) films were deposited by coaxial arc plasma deposition with a boron-blended graphite target at a base pressure of <10{sup −3} Pa and at hydrogen pressures of ≤53.3 Pa. The hydrogenation effects on the electrical properties of the films were investigated in terms of chemical bonding. Hydrogen-scattering spectrometry showed that the maximum hydrogen content was 35 at. % for the film produced at 53.3-Pa hydrogen pressure. The Fourier-transform infrared spectra showed strong absorptions by sp{sup 3} C–H bonds, which were specific to the UNCD/a-C:H, and can be attributed to hydrogen atoms terminating the dangling bonds at ultrananocrystalline diamond grain boundaries. Temperature-dependence of the electrical conductivity showed that the films changed from semimetallic to semiconducting with increasing hydrogen pressure, i.e., with enhanced hydrogenation, probably due to hydrogenation suppressing the formation of graphitic bonds, which are a source of carriers. Carrier transport in semiconducting hydrogenated films can be explained by a variable-range hopping model. The rectifying action of heterojunctions comprising the hydrogenated films and n-type Si substrates implies carrier transport in tunneling.

  7. Time-Resolved Spectroscopic Observation of Deposition Processes of Ultrananocrystalline Diamond/Amorphous Carbon Composite Films by Using a Coaxial Arc Plasma Gun

    Science.gov (United States)

    Hanada, Kenji; Yoshitake, Tsuyoshi; Nishiyama, Takashi; Nagayama, Kunihito

    2010-08-01

    The deposition of ultrananocrystalline diamond (UNCD)/amorphous carbon composite films using a coaxial arc plasma gun in vacuum and, for comparison, in a 53.3 Pa hydrogen atmosphere was spectroscopically observed using a high-speed camera equipped with narrow-band-pass filters. UNCD crystallites with diameters of approximately 1.6 nm were formed even in vacuum. These extremely small crystallites imply that the formation is predominantly due to nucleation without the subsequent growth. Even in vacuum, emissions from C+ ions, C atoms, and C2 dimers lasted for approximately 100 µs, although the emission lifetimes of these species are generally 10 ns. We consider that the nucleation is due to the supersaturated environment containing excited carbon species with large number densities.

  8. Biological characteristics of the MG-63 human osteosarcoma cells on composite tantalum carbide/amorphous carbon films.

    Science.gov (United States)

    Chang, Yin-Yu; Huang, Heng-Li; Chen, Ya-Chi; Hsu, Jui-Ting; Shieh, Tzong-Ming; Tsai, Ming-Tzu

    2014-01-01

    Tantalum (Ta) is a promising metal for biomedical implants or implant coating for orthopedic and dental applications because of its excellent corrosion resistance, fracture toughness, and biocompatibility. This study synthesizes biocompatible tantalum carbide (TaC) and TaC/amorphous carbon (a-C) coatings with different carbon contents by using a twin-gun magnetron sputtering system to improve their biological properties and explore potential surgical implant or device applications. The carbon content in the deposited coatings was regulated by controlling the magnetron power ratio of the pure graphite and Ta cathodes. The deposited TaC and TaC/a-C coatings exhibited better cell viability of human osteosarcoma cell line MG-63 than the uncoated Ti and Ta-coated samples. Inverted optical and confocal imaging was used to demonstrate the cell adhesion, distribution, and proliferation of each sample at different time points during the whole culture period. The results show that the TaC/a-C coating, which contained two metastable phases (TaC and a-C), was more biocompatible with MG-63 cells compared to the pure Ta coating. This suggests that the TaC/a-C coatings exhibit a better biocompatible performance for MG-63 cells, and they may improve implant osseointegration in clinics. PMID:24760085

  9. Biological characteristics of the MG-63 human osteosarcoma cells on composite tantalum carbide/amorphous carbon films.

    Directory of Open Access Journals (Sweden)

    Yin-Yu Chang

    Full Text Available Tantalum (Ta is a promising metal for biomedical implants or implant coating for orthopedic and dental applications because of its excellent corrosion resistance, fracture toughness, and biocompatibility. This study synthesizes biocompatible tantalum carbide (TaC and TaC/amorphous carbon (a-C coatings with different carbon contents by using a twin-gun magnetron sputtering system to improve their biological properties and explore potential surgical implant or device applications. The carbon content in the deposited coatings was regulated by controlling the magnetron power ratio of the pure graphite and Ta cathodes. The deposited TaC and TaC/a-C coatings exhibited better cell viability of human osteosarcoma cell line MG-63 than the uncoated Ti and Ta-coated samples. Inverted optical and confocal imaging was used to demonstrate the cell adhesion, distribution, and proliferation of each sample at different time points during the whole culture period. The results show that the TaC/a-C coating, which contained two metastable phases (TaC and a-C, was more biocompatible with MG-63 cells compared to the pure Ta coating. This suggests that the TaC/a-C coatings exhibit a better biocompatible performance for MG-63 cells, and they may improve implant osseointegration in clinics.

  10. Interaction of hydrogenated amorphous silicon films with transparent conductive films

    OpenAIRE

    Kitagawa, M.; Mori, K; Ishihara, S.; Ohno, M.; Hirao, T.; Yoshioka, Y.; Kohiki, S

    1983-01-01

    The effects of the deposition temperature on the interaction of the hydrogenated amorphous silicon films with indium-tin-oxide and tin-oxide films have been investigated in the temperature range 150-300 degrees C, using Auger electron spectroscopy, secondary ion mass spectrometry, and scanning electron microscopy. It was found that the constituent atoms such as indium and tin are detected in the thin amorphous silicon films deposited. Around the interface between the transparent conductive fi...

  11. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    OpenAIRE

    Khan, R U A; Silva, S. R. P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p layer had to be reduced from 9 to 2.5 nm in order to ensure sufficient conduction through the PAC film. Although the resulting external parameters suggest a decrease in the device efficiency from 9...

  12. Structure and gas-barrier properties of amorphous hydrogenated carbon films deposited on inner walls of cylindrical polyethylene terephthalate by plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Li, Jing; Gong, Chunzhi; Tian, Xiubo; Yang, Shiqin; Fu, Ricky K. Y.; Chu, Paul K.

    2009-01-01

    The influence of radio-frequency (RF) power on the structure and gas permeation through amorphous hydrogenated carbon films deposited on cylindrical polyethylene terephthalate (PET) samples is investigated. The results show that a higher radio-frequency power leads to a smaller sp 3/sp 2 value but produces fewer defects with smaller size. The permeability of PET samples decreases significantly after a-C:H deposition and the RF only exerts a small influence. However, the coating uniformity, color, and wettability of the surface are affected by the RF power. A higher RF power results in to better uniformity and it may be attributed to the combination of the high-density plasma and sample heating.

  13. Structure and gas-barrier properties of amorphous hydrogenated carbon films deposited on inner walls of cylindrical polyethylene terephthalate by plasma-enhanced chemical vapor deposition

    International Nuclear Information System (INIS)

    The influence of radio-frequency (RF) power on the structure and gas permeation through amorphous hydrogenated carbon films deposited on cylindrical polyethylene terephthalate (PET) samples is investigated. The results show that a higher radio-frequency power leads to a smaller sp3/sp2 value but produces fewer defects with smaller size. The permeability of PET samples decreases significantly after a-C:H deposition and the RF only exerts a small influence. However, the coating uniformity, color, and wettability of the surface are affected by the RF power. A higher RF power results in to better uniformity and it may be attributed to the combination of the high-density plasma and sample heating.

  14. Amorphous metallic films in silicon metallization systems

    Science.gov (United States)

    So, F.; Kolawa, E.; Nicolet, M. A.

    1985-01-01

    Diffusion barrier research was focussed on lowering the chemical reactivity of amorphous thin films on silicon. An additional area of concern is the reaction with metal overlays such as aluminum, silver, and gold. Gold was included to allow for technology transfer to gallium arsenide PV cells. Amorphous tungsten nitride films have shown much promise. Stability to annealing temperatures of 700, 800, and 550 C were achieved for overlays of silver, gold, and aluminum, respectively. The lower results for aluminum were not surprising because there is an eutectic that can form at a lower temperature. It seems that titanium and zirconium will remove the nitrogen from a tungsten nitride amorphous film and render it unstable. Other variables of research interest were substrate bias and base pressure during sputtering.

  15. Growth, characterisation and electronic applications of amorphous hydrogenated carbon

    CERN Document Server

    Paul, S

    2000-01-01

    temperature on GaAs, has been studied and concluded to be satisfactory on the basis of good adherence and low leakage currents. Such a structure was motivated by the applicability in Metal Insulator Semiconductor Field Effect Transistors (MISFET). My thesis proposes solutions to a number of riddles associated with the material, hydrogenated amorphous carbon, (a-C:H). This material has lately generated interest in the electronic engineering community, owing to some remarkable properties. The characterisation of amorphous carbon films, grown by radio frequency plasma enhanced chemical vapour deposition has been reported. The coexistence of multiple phases in the same a-C:H film manifests itself in the inconsistent electrical behaviour of different parts of the film, thus rendering it difficult to predict the nature of films. For the first time, in this thesis, a reliable prediction of Schottky contact formation on a-C:H films is reported. A novel and simple development on a Scanning Electron Microscope, configu...

  16. Synthesis of amorphous carbon nitride by ion implantation

    Institute of Scientific and Technical Information of China (English)

    ChenZ.; OlofinjanaA.; BellJ

    2001-01-01

    N2+ were implanted into diamondlike carbon (DLC) films in an attempt to synthesizeamorphous carbon nitride. The DLC films were previously deposited on steel substrate by using anion beam sputtering deposition (IBSD) where a single Kaufman type ion gun with argon sourcewas used to sputter a graphite target and simultaneously bombard the growing film. Parallel to theion implantation route, amorphous carbon nitride films were also synthesized by directly using thereactive ion beam sputtering deposition (RIBSD) with nitrogen source to incorporate nitrogen intothe film. The structure and properties of the films were determined by using Raman spectroscopy,XPS and nano-indentation. The implantation of N2+ into a-C films offers a higher hardness thanthat directly synthesized by RIBSD, probably through an increase in sp3/sp2 ratio and in the pro-portion of nitrogen atoms chemically bonding to carbon atoms. The results show that althoughthere are differences in film composition, structure and properties between these two processes,both methods can be used for synthesis of nitrogen-containing amorphous DLC thin films whichsignificantly modify the substrate surface.

  17. Electrochromism of amorphous ruthenium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Se-Hee; Liu, Ping; Tracy, C. Edwin; Deb, Satyen K. [National Renewable Energy Laboratory, Center for Basic Sciences, 1617 Cole Boulevard, Golden, CO 80401 (United States); Cheong, Hyeonsik M. [Sogang University, Shinsoo-Dong, Seoul 121-742 (Korea, Republic of)

    2003-12-01

    We report on the electrochromic behavior of amorphous ruthenium oxide thin films and their electrochemical characteristics for use as counterelectrodes for electrochromic devices. Hydrous ruthenium oxide thin films were prepared by cyclic voltammetry on ITO coated glass substrates from an aqueous ruthenium chloride solution. The cyclic voltammograms of this material show the capacitive behavior including two redox reaction peaks in each cathodic and anodic scan. The ruthenium oxide thin film electrode exhibits a 50% modulation of optical transmittance at 670 nm wavelength with capacitor charge/discharge.

  18. Amorphous Carbon-Boron Nitride Nanotube Hybrids

    Science.gov (United States)

    Kim, Jae Woo (Inventor); Siochi, Emilie J. (Inventor); Wise, Kristopher E. (Inventor); Lin, Yi (Inventor); Connell, John (Inventor)

    2016-01-01

    A method for joining or repairing boron nitride nanotubes (BNNTs). In joining BNNTs, the nanotube structure is modified with amorphous carbon deposited by controlled electron beam irradiation to form well bonded hybrid a-C/BNNT structures. In repairing BNNTs, the damaged site of the nanotube structure is modified with amorphous carbon deposited by controlled electron beam irradiation to form well bonded hybrid a-C/BNNT structures at the damage site.

  19. Amorphous silicon for thin-film transistors

    OpenAIRE

    Schropp, Rudolf Emmanuel Isidore

    1987-01-01

    Hydrogenated amorphous silicon (a-Si:H) has considerable potential as a semiconducting material for large-area photoelectric and photovoltaic applications. Moreover, a-Si:H thin-film transistors (TFT’s) are very well suited as switching devices in addressable liquid crystal display panels and addressable image sensor arrays, due to a new technology of low-cost, Iow-temperature processing overlarge areas. ... Zie: Abstract

  20. Revealing the 1 nm/s Extensibility of Nanoscale Amorphous Carbon in a Scanning Electron Microscope

    DEFF Research Database (Denmark)

    Zhang, Wei

    2013-01-01

    In an ultra-high vacuum scanning electron microscope, the edged branches of amorphous carbon film (∼10 nm thickness) can be continuously extended with an eye-identifying speed (on the order of ∼1 nm/s) under electron beam. Such unusual mobility of amorphous carbon may be associated with deformation...

  1. Radiation resistance studies of amorphous silicon films

    Science.gov (United States)

    Woodyard, James R.; Payson, J. Scott

    1989-01-01

    Hydrogenated amorphous silicon thin films were irradiated with 2.00 MeV helium ions using fluences ranging from 1E11 to 1E15 cm(-2). The films were characterized using photothermal deflection spectroscopy and photoconductivity measurements. The investigations show that the radiation introduces sub-band-gap states 1.35 eV below the conduction band and the states increase supralinearly with fluence. Photoconductivity measurements suggest the density of states above the Fermi energy is not changing drastically with fluence.

  2. Large-scale and patternable graphene: direct transformation of amorphous carbon film into graphene/graphite on insulators via Cu mediation engineering and its application to all-carbon based devices

    Science.gov (United States)

    Chen, Yu-Ze; Medina, Henry; Lin, Hung-Chiao; Tsai, Hung-Wei; Su, Teng-Yu; Chueh, Yu-Lun

    2015-01-01

    Chemical vapour deposition of graphene was the preferred way to synthesize graphene for multiple applications. However, several problems related to transfer processes, such as wrinkles, cleanness and scratches, have limited its application at the industrial scale. Intense research was triggered into developing alternative synthesis methods to directly deposit graphene on insulators at low cost with high uniformity and large area. In this work, we demonstrate a new concept to directly achieve growth of graphene on non-metal substrates. By exposing an amorphous carbon (a-C) film in Cu gaseous molecules after annealing at 850 °C, the carbon (a-C) film surprisingly undergoes a noticeable transformation to crystalline graphene. Furthermore, the thickness of graphene could be controlled, depending on the thickness of the pre-deposited a-C film. The transformation mechanism was investigated and explained in detail. This approach enables development of a one-step process to fabricate electrical devices made of all carbon material, highlighting the uniqueness of the novel approach for developing graphene electronic devices. Interestingly, the carbon electrodes made directly on the graphene layer by our approach offer a good ohmic contact compared with the Schottky barriers usually observed on graphene devices using metals as electrodes.Chemical vapour deposition of graphene was the preferred way to synthesize graphene for multiple applications. However, several problems related to transfer processes, such as wrinkles, cleanness and scratches, have limited its application at the industrial scale. Intense research was triggered into developing alternative synthesis methods to directly deposit graphene on insulators at low cost with high uniformity and large area. In this work, we demonstrate a new concept to directly achieve growth of graphene on non-metal substrates. By exposing an amorphous carbon (a-C) film in Cu gaseous molecules after annealing at 850 °C, the carbon (a

  3. POROUS AMORPHOUS FLUOROPOLYMER FILMS WITH ULTRALOW DIELECTRIC CONSTANT

    Institute of Scientific and Technical Information of China (English)

    DING SHI-JIN; WANG PENG-FEI; ZHANG WEI; WANG JI-TAO; WEI WILLIAM LEE; ZHANG YE-WEN; KIA ZHONG-FU

    2000-01-01

    With the development of ultralarge scale integrated circuit, new interlayer dielectrics with low dielectric constant for multilevel interconnections are required, instead of conventional SiO2 films. For the sake of seeking perfect dielectrics, amorphous fluoropolymer (AF) thin film with a thickness of about 0.9μm has been prepared by spin-coating method, following the principle of phase separation. By capacitance-voltage (C-V) measurements the dielectric constant of the thin film is equal to 1.57 at 1 MHz, which is attributed to numerous pores contained in the film matrix. X-ray photoelectron spectroscopy (XPS) spectra show that after annealing, about 71% CFa groups in the AF film have decomposed into CF2, CF, etc. This leads to the increase of CF2 groups by three times and CF groups by 8% in the AF film. In a word, compared with the film without being annealed, about 25% carbon, 7% fluorine and 12% oxygen atoms will be lost after annealing at 400℃ for 30min.

  4. Research Update: Direct conversion of amorphous carbon into diamond at ambient pressures and temperatures in air

    International Nuclear Information System (INIS)

    We report on fundamental discovery of conversion of amorphous carbon into diamond by irradiating amorphous carbon films with nanosecond lasers at room-temperature in air at atmospheric pressure. We can create diamond in the form of nanodiamond (size range <100 nm) and microdiamond (>100 nm). Nanosecond laser pulses are used to melt amorphous diamondlike carbon and create a highly undercooled state, from which various forms of diamond can be formed upon cooling. The quenching from the super undercooled state results in nucleation of nanodiamond. It is found that microdiamonds grow out of highly undercooled state of carbon, with nanodiamond acting as seed crystals

  5. Pyrolyzed thin film carbon

    Science.gov (United States)

    Tai, Yu-Chong (Inventor); Liger, Matthieu (Inventor); Harder, Theodore (Inventor); Konishi, Satoshi (Inventor); Miserendino, Scott (Inventor)

    2010-01-01

    A method of making carbon thin films comprises depositing a catalyst on a substrate, depositing a hydrocarbon in contact with the catalyst and pyrolyzing the hydrocarbon. A method of controlling a carbon thin film density comprises etching a cavity into a substrate, depositing a hydrocarbon into the cavity, and pyrolyzing the hydrocarbon while in the cavity to form a carbon thin film. Controlling a carbon thin film density is achieved by changing the volume of the cavity. Methods of making carbon containing patterned structures are also provided. Carbon thin films and carbon containing patterned structures can be used in NEMS, MEMS, liquid chromatography, and sensor devices.

  6. Methane Flow Rate Effects On The Optical Properties of Amorphous Silicon Carbon (a-SiC:H Films Deposited By DC Sputtering Methods

    Directory of Open Access Journals (Sweden)

    Rosari Saleh

    2002-04-01

    Full Text Available We have investigated the refractive index (n and the optical absorption coeffi cient (α from refl ection and transmission measurements on hydrogenated amorphous silicon carbon (a-SiC:H fi lms. The a-SiC:H fi lms were prepared by dc sputtering method using silicon target in argon and methane gas mixtures. The refractive index (n decreases as the methane fl ow rate increase. The optical absorption coeffi cient (α shifts to higher energy with increasing methane fl ow rate. At higher methane fl ow rate, the fi lms tend to be more disorder and have wider optical gap. The relation of the optical properties and the disorder amorphous network with the compositional properties will be discussed.

  7. Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth

    Energy Technology Data Exchange (ETDEWEB)

    Barbe, Jeremy, E-mail: jeremy.barbe@hotmail.com [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); Xie, Ling; Leifer, Klaus [Department of Engineering Sciences, Uppsala University, Box 534, S-751 21 Uppsala (Sweden); Faucherand, Pascal; Morin, Christine; Rapisarda, Dario; De Vito, Eric [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Makasheva, Kremena; Despax, Bernard [Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); CNRS, LAPLACE, F-31062 Toulouse (France); Perraud, Simon [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)

    2012-11-01

    The present study demonstrates the growth of silicon nanocrystals on amorphous silicon carbide alloy thin films. Amorphous silicon carbide films [a-Si{sub 1-x}C{sub x}:H (with x < 0.3)] were obtained by plasma enhanced chemical vapor deposition from a mixture of silane and methane diluted in hydrogen. The effect of varying the precursor gas-flow ratio on the film properties was investigated. In particular, a wide optical band gap (2.3 eV) was reached by using a high methane-to-silane flow ratio during the deposition of the a-Si{sub 1-x}C{sub x}:H layer. The effect of short-time annealing at 700 Degree-Sign C on the composition and properties of the layer was studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was observed that the silicon-to-carbon ratio in the layer remains unchanged after short-time annealing, but the reorganization of the film due to a large dehydrogenation leads to a higher density of SiC bonds. Moreover, the film remains amorphous after the performed short-time annealing. In a second part, it was shown that a high density (1 Multiplication-Sign 10{sup 12} cm{sup -2}) of silicon nanocrystals can be grown by low pressure chemical vapor deposition on a-Si{sub 0.8}C{sub 0.2} surfaces at 700 Degree-Sign C, from silane diluted in hydrogen. The influence of growth time and silane partial pressure on nanocrystals size and density was studied. It was also found that amorphous silicon carbide surfaces enhance silicon nanocrystal nucleation with respect to SiO{sub 2}, due to the differences in surface chemical properties. - Highlights: Black-Right-Pointing-Pointer Silicon nanocrystals (Si-NC) growth on amorphous silicon carbide alloy thin films Black-Right-Pointing-Pointer Plasma deposited amorphous silicon carbide films with well-controlled properties Black-Right-Pointing-Pointer Study on the thermal effect of 700 Degree-Sign C short-time annealing on the layer properties Black-Right-Pointing-Pointer Low pressure

  8. Amorphous Dielectric Thin Films with Extremely Low Mechanical Loss

    OpenAIRE

    Liu X; Queen D.R.; Metcalf T.H.; Karel J.E.; Hellman F.

    2015-01-01

    The ubiquitous low-energy excitations are one of the universal phenomena of amorphous solids. These excitations dominate the acoustic, dielectric, and thermal properties of structurally disordered solids. One exception has been a type of hydrogenated amorphous silicon (a-Si:H) with 1 at.% H. Using low temperature elastic and thermal measurements of electron-beam evap-orated amorphous silicon (a-Si), we show that TLS can be eliminated in this system as the films become denser and more structur...

  9. Recent progress in the synthesis and characterization of amorphous and crystalline carbon nitride coatings

    CERN Document Server

    Widlow, I

    2000-01-01

    This review summarizes our most recent findings in the structure and properties of amorphous and crystalline carbon nitride coatings, synthesized by reactive magnetron sputtering. By careful control of the plasma conditions via proper choice of process parameters such as substrate bias, target power and gas pressure, one can precisely control film structure and properties. With this approach, we were able to produce amorphous carbon nitride films with controlled hardness and surface roughness. In particular, we can synthesize ultrathin (1 nm thick) amorphous carbon nitride films to be sufficiently dense and uniform that they provide adequate corrosion protection for hard disk applications. We demonstrated the strong correlation between ZrN (111) texture and hardness in CN sub x /ZrN superlattice coatings. Raman spectroscopy and near-edge X-ray absorption show the predominance of sp sup 3 -bonded carbon in these superlattice coatings.

  10. Thin films of hydrogenated amorphous carbon (a-C:H) obtained through chemical vapor deposition assisted by plasma; Peliculas delgadas de carbono amorfo hidrogenado (a-C:H) obtenidas mediante deposito quimico de vapores asistido por plasma

    Energy Technology Data Exchange (ETDEWEB)

    Mejia H, J.A.; Camps C, E.E.; Escobar A, L.; Romero H, S.; Chirino O, S. [ININ, 52045 Ocoyoacac, Estado de Mexico (Mexico); Muhl S, S. [IIM-UNAM, 04510 Mexico D.F. (Mexico)

    2004-07-01

    Films of hydrogenated amorphous carbon (a-C:H) were deposited using one source of microwave plasma with magnetic field (type ECR), using mixtures of H{sub 2}/CH{sub 4} in relationship of 80/20 and 95/05 as precursory gases, with work pressures of 4X10{sup -4} to 6x10{sup -4} Torr and an incident power of the discharge of microwaves with a constant value of 400 W. It was analyzed the influence among the properties of the films, as the deposit rate, the composition and the bonding types, and the deposit conditions, such as the flow rates of the precursory gases and the polarization voltage of the sample holders. (Author)

  11. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    NARCIS (Netherlands)

    Khan, R.U.A.; Silva, S.R.P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p

  12. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor deposition (PECVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scattering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  13. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    LIAO NaiMan; LI Wei; KUANG YueJun; JIANG YaDong; LI ShiBin; WU ZhiMing; QI KangCheng

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor depo-sition (PEOVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scat-tering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  14. Superconductivity and unusual magnetic behavior in amorphous carbon

    OpenAIRE

    Felner, Israel

    2013-01-01

    Traces of superconductivity (SC) at elevated temperatures (up to 65 K) were observed by magnetic measurements in three different inhomogeneous sulfur doped amorphous carbon (a-C) systems: (a) in commercial and (b) synthesized powders and (c) in a-C thin films. (a) Studies performed on commercial (a-C) powder which contains 0.21% of sulfur, revealed traces of non-percolated superconducting phases below Tc = 65 K. The SC volume fraction is enhanced by the sulfur doping. (b) a-C powder obtained ...

  15. Protolytic carbon film technology

    Energy Technology Data Exchange (ETDEWEB)

    Renschler, C.L.; White, C.A.

    1996-04-01

    This paper presents a technique for the deposition of polyacrylonitrile (PAN) on virtually any surface allowing carbon film formation with only the caveat that the substrate must withstand carbonization temperatures of at least 600 degrees centigrade. The influence of processing conditions upon the structure and properties of the carbonized film is discussed. Electrical conductivity, microstructure, and morphology control are also described.

  16. Electrochromic study on amorphous tungsten oxide films by sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Li, Chuan, E-mail: cli10@yahoo.com [Department of Biomedical Engineering, National Yang Ming University, Taipei 11221, Taiwan (China); Department of Mechanical Engineering, National Central University, Jhongli, Taoyuan 32001, Taiwan (China); Hsieh, J.H. [Department of Materials Engineering, Ming Chi University of Technology, Taishan, Taipei 24301, Taiwan (China); Hung, Ming-Tsung [Department of Mechanical Engineering, National Central University, Jhongli, Taoyuan 32001, Taiwan (China); Huang, B.Q. [Department of Biomedical Engineering, National Yang Ming University, Taipei 11221, Taiwan (China)

    2015-07-31

    Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet–visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10–20 sccm) assures the deposition of amorphous WO{sub 3} films. To explore the electrochromic function of deposited WO{sub 3} films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO{sub 3} films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO{sub 3} film with composition close to its stoichiometry is an optimal choice for electrochromic function. - Highlights: • Amorphous WO{sub 3} films are deposited by DC sputtering under different O{sub 2} flow rates. • Higher oxygen flow rate (> 10 sccm) assures the deposition of amorphous WO{sub 3} films. • Both potentiostat and cyclic voltammetry make WO{sub 3} films switch its color. • An optimal electrochromic WO{sub 3} is to make films close to its stoichiometry.

  17. Electrochromic study on amorphous tungsten oxide films by sputtering

    International Nuclear Information System (INIS)

    Tungsten oxide films under different oxygen flow rates are deposited by DC sputtering. The voltage change at target and analyses for the deposited films by X-ray diffraction, scanning electronic microscope, X-ray photoelectron spectroscopy and ultraviolet–visible-near infrared spectroscopy consistently indicate that low oxygen flow rate (5 sccm) only creates metal-rich tungsten oxide films, while higher oxygen flow rate (10–20 sccm) assures the deposition of amorphous WO3 films. To explore the electrochromic function of deposited WO3 films, we use electrochemical tests to perform the insertion of lithium ions and electrons into films. The WO3 films switch between color and bleach states effectively by both potentiostat and cyclic voltammetry. Quantitative evaluation on electrochemical tests indicates that WO3 film with composition close to its stoichiometry is an optimal choice for electrochromic function. - Highlights: • Amorphous WO3 films are deposited by DC sputtering under different O2 flow rates. • Higher oxygen flow rate (> 10 sccm) assures the deposition of amorphous WO3 films. • Both potentiostat and cyclic voltammetry make WO3 films switch its color. • An optimal electrochromic WO3 is to make films close to its stoichiometry

  18. Heat-Induced Agglomeration of Amorphous Silicon Nanoparticles Toward the Formation of Silicon Thin Film.

    Science.gov (United States)

    Jang, Bo Yun; Kim, Ja Young; Seo, Gyeongju; Shin, Chae-Ho; Ko, Chang Hyun

    2016-01-01

    The thermal behavior of silicon nanoparticles (Si NPs) was investigated for the preparation of silicon thin film using a solution process. TEM analysis of Si NPs, synthesized by inductively coupled plasma, revealed that the micro-structure of the Si NPs was amorphous and that the Si NPs had melted and merged at a comparatively low temperature (~750 °C) considering bulk melting temperature of silicon (1414 °C). A silicon ink solution was prepared by dispersing amorphous Si NPs in propylene glycol (PG). It was then coated onto a silicon wafer and a quartz plate to form a thin film. These films were annealed in a vacuum or in an N₂ environment to increase their film density. N2 annealing at 800 °C and 1000 °C induced the crystallization of the amorphous thin film. An elemental analysis by the SIMS depth profile showed that N₂annealing at 1000 °C for 180 min drastically reduced the concentrations of carbon and oxygen inside the silicon thin film. These results indicate that silicon ink prepared using amorphous Si NPs in PG can serve as a proper means of preparing silicon thin film via solution process. PMID:27398566

  19. Oxygenated amorphous carbon for resistive memory applications

    Science.gov (United States)

    Santini, Claudia A.; Sebastian, Abu; Marchiori, Chiara; Jonnalagadda, Vara Prasad; Dellmann, Laurent; Koelmans, Wabe W.; Rossell, Marta D.; Rossel, Christophe P.; Eleftheriou, Evangelos

    2015-10-01

    Carbon-based electronics is a promising alternative to traditional silicon-based electronics as it could enable faster, smaller and cheaper transistors, interconnects and memory devices. However, the development of carbon-based memory devices has been hampered either by the complex fabrication methods of crystalline carbon allotropes or by poor performance. Here we present an oxygenated amorphous carbon (a-COx) produced by physical vapour deposition that has several properties in common with graphite oxide. Moreover, its simple fabrication method ensures excellent reproducibility and tuning of its properties. Memory devices based on a-COx exhibit outstanding non-volatile resistive memory performance, such as switching times on the order of 10 ns and cycling endurance in excess of 104 times. A detailed investigation of the pristine, SET and RESET states indicates a switching mechanism based on the electrochemical redox reaction of carbon. These results suggest that a-COx could play a key role in non-volatile memory technology and carbon-based electronics.

  20. Amorphous carbon interlayers for gold on elastomer stretchable conductors

    Science.gov (United States)

    Manzoor, M. U.; Tuinea-Bobe, C. L.; McKavanagh, F.; Byrne, C. P.; Dixon, D.; Maguire, P. D.; Lemoine, P.

    2011-06-01

    Gold on polydimethylsiloxane (PDMS) stretchable conductors were prepared using a novel approach by interlacing an hydrogenated amorphous carbon (a-C : H) layer between the deposited metal layer and the elastomer. AFM analysis of the a-C : H film surface before gold deposition shows nanoscale buckling, the corresponding increase in specific surface area corresponds to a strain compensation for the first 4-6% of bi-axial tensile loading. Without this interlayer, the deposited gold films show much smaller and uni-directional ripples as well as more cracks and delaminations. With a-C : H interlayer, the initial electrical resistivity of the metal film decreases markedly (280-fold decrease to 8 × 10-6 Ω cm). This is not due to conduction within the carbon interlayer; both a-C : H/PDMS and PDMS substrates are electrically insulating. Upon cyclic tensile loading, both films become more resistive, but return to their initial state after 20 tensile cycles up to 60% strain. Profiling experiments using secondary ion mass spectroscopy and x-ray photoelectron spectroscopy indicate that the a-C : H layer intermixes with the PDMS, resulting in a graded layer of decreasing stiffness. We believe that both this graded layer and the surface buckling contribute to the observed improvement in the electrical performance of these stretchable conductors.

  1. Electrical properties of Bi-implanted amorphous chalcogenide films

    International Nuclear Information System (INIS)

    The impact of Bi implantation on the conductivity and the thermopower of GeTe, Ge–Sb–Te, and Ga–La–S films is investigated. The enhanced conductivity appears to be notably sensitive to a dose of an implant. Incorporation of Bi in amorphous chalcogenide films at doses up to 1 × 1015 cm−2 is seen not to change the majority carrier type and activation energy for the conduction process. Higher implantation doses may reverse the majority carrier type in the studied films. Electron conductivity was observed in GeTe films implanted with Bi at a dose of 2 × 1016 cm−2. These studies indicate that native coordination defects present in amorphous chalcogenide semiconductors can be deactivated by means of ion implantation. A substantial density of implantation-induced traps in the studied films and their interfaces with silicon is inferred from analysis of the space-charge-limited current and capacitance-voltage characteristics taken on Au/amorphous chalcogenide/Si structures. - Highlights: • Electron conductivity is observed in Bi-implanted GeTe films. • Higher conductivity in Bi-implanted films stems from increased density of electrically active defects. • Bi implanted in amorphous chalcogenides may promote formation of a more chemically ordered alloy

  2. Electrical properties of Bi-implanted amorphous chalcogenide films

    Energy Technology Data Exchange (ETDEWEB)

    Fedorenko, Yanina G.

    2015-08-31

    The impact of Bi implantation on the conductivity and the thermopower of GeTe, Ge–Sb–Te, and Ga–La–S films is investigated. The enhanced conductivity appears to be notably sensitive to a dose of an implant. Incorporation of Bi in amorphous chalcogenide films at doses up to 1 × 10{sup 15} cm{sup −2} is seen not to change the majority carrier type and activation energy for the conduction process. Higher implantation doses may reverse the majority carrier type in the studied films. Electron conductivity was observed in GeTe films implanted with Bi at a dose of 2 × 10{sup 16} cm{sup −2}. These studies indicate that native coordination defects present in amorphous chalcogenide semiconductors can be deactivated by means of ion implantation. A substantial density of implantation-induced traps in the studied films and their interfaces with silicon is inferred from analysis of the space-charge-limited current and capacitance-voltage characteristics taken on Au/amorphous chalcogenide/Si structures. - Highlights: • Electron conductivity is observed in Bi-implanted GeTe films. • Higher conductivity in Bi-implanted films stems from increased density of electrically active defects. • Bi implanted in amorphous chalcogenides may promote formation of a more chemically ordered alloy.

  3. Blood-compatibility of La2O3 Doped Amorphous Carbon Film%氧化镧掺杂非晶碳薄膜的血液相容性

    Institute of Scientific and Technical Information of China (English)

    张麟; 陈弟虎; 于凤梅; 黄展云; 潘仕荣

    2009-01-01

    La2O3doped amorphous carbon(a-C) films were deposited on silicon substrates using a Radio-Frequency magnetron sputtering. The effect of doped rare earth on the microstructure,composition, surface morphology and hydrophilicity of a-C films were studied using Raman spectra and XPS, respectively. Results show that rare earth addition has a suppressive effect on the ratio of sp3-bond to sp2- bond in the a-C films and the hydrophobicity of rare earth doped a-C films is increased. The observation of platelet adhesion shows that the anti-cruor of a-C films can be improved by rare earth doped and the sample added appropriate rare earth shows the best blood compatibility. The mechanism of haemocompatibility of a-C films doped rare earth is discussed.%采用射频磁控溅射方法制备了氧化镧掺杂的非晶碳薄膜.利用拉曼光谱,光电子能谱等方法, 研究了氧化镧掺杂对非晶碳薄膜的微结构、成分、形貌及亲水性的影响.结果表明:在非晶碳薄膜中掺入氧化镧后,薄膜中sp3/sp2的比率发生显著变化,薄膜的疏水性明显提高.血小板粘附实验表明,掺杂氧化镧有利于提高非晶碳薄膜的抗凝血性能,适当的掺杂量能使薄膜的血液相容性得到优化.并分析了氧化镧对材料的血液相容性能的影响机制.

  4. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films

    Energy Technology Data Exchange (ETDEWEB)

    Shin Jinhong [Texas Materials Institute, University of Texas at Austin, Austin, TX 78750 (United States); Waheed, Abdul [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Winkenwerder, Wyatt A. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Kim, Hyun-Woo [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Agapiou, Kyriacos [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Jones, Richard A. [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Hwang, Gyeong S. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Ekerdt, John G. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States)]. E-mail: ekerdt@che.utexas.edu

    2007-05-07

    Chemical vapor deposition growth of amorphous ruthenium-phosphorus films on SiO{sub 2} containing {approx} 15% phosphorus is reported. cis-Ruthenium(II)dihydridotetrakis-(trimethylphosphine), cis-RuH{sub 2}(PMe{sub 3}){sub 4} (Me = CH{sub 3}) was used at growth temperatures ranging from 525 to 575 K. Both Ru and P are zero-valent. The films are metastable, becoming increasingly more polycrystalline upon annealing to 775 and 975 K. Surface studies illustrate that demethylation is quite efficient near 560 K. Precursor adsorption at 135 K or 210 K and heating reveal the precursor undergoes a complex decomposition process in which the hydride and trimethylphosphine ligands are lost at temperatures as low at 280 K. Phosphorus and its manner of incorporation appear responsible for the amorphous-like character. Molecular dynamics simulations are presented to suggest the local structure in the films and the causes for phosphorus stabilizing the amorphous phase.

  5. Friction and wear of plasma-deposited amorphous hydrogenated films on silicon nitride

    Science.gov (United States)

    Miyoshi, Kazuhisa

    1991-01-01

    An investigation was conducted to examine the friction and wear behavior of amorphous hydrogenated carbon (a-C:H) films in sliding contact with silicon nitride pins in both dry nitrogen and humid air environments. Amorphous hydrogenated carbon films approximately 0.06 micron thick were deposited on silicon nitride flat substrates by using the 30 kHz ac glow discharge of a planar plasma reactor. The results indicate that an increase in plasma deposition power gives an increase in film density and hardness. The high-density a-C:H films deposited behaved tribologically much like bulk diamond. In the dry nitrogen environment, a tribochemical reaction produced a substance, probably a hydrocarbon-rich layer, that decreased the coefficient of friction. In the humid air environment, tribochemical interactions drastically reduced the wear life of a-C:H films and water vapor greatly increased the friction. Even in humid air, effective lubrication is possible with vacuum-annealed a-C:H films. The vacuum-annealed high-density a-C:H film formed an outermost superficial graphitic layer, which behaved like graphite, on the bulk a-C:H film. Like graphite, the annealed a-C:H film with the superficial graphitic layer showed low friction when adsorbed water vapor was present.

  6. Elastic properties of amorphous thin films studied by Rayleigh waves

    International Nuclear Information System (INIS)

    Physical vapor deposition in ultra-high vacuum was used to co-deposit nickel and zirconium onto quartz single crystals and grow amorphous Ni1-xZrx (0.1 < x < 0.87) thin film. A high-resolution surface acoustic wave technique was developed for in situ measurement of film shear moduli. The modulus has narrow maxima at x = 0. 17, 0.22, 0.43, 0.5, 0.63, and 0.72, reflecting short-range ordering and formation of aggregates in amorphous phase. It is proposed that the aggregates correspond to polytetrahedral atom arrangements limited in size by geometrical frustration

  7. Microstructural analyses of amorphic diamond, i-C, and amorphous carbon

    DEFF Research Database (Denmark)

    Collins, C. B.; Davanloo, F.; Jander, D.R.;

    1992-01-01

    comparative examinations of the microstructures of samples of amorphic diamond, i-C, and amorphous carbon. Four distinct morphologies were found that correlated closely with the energy densities used in preparing the different materials. Journal of Applied Physics is copyrighted by The American Institute of...... Physics....

  8. 纳米非晶碳薄膜的制备及其场致电子发射特性%Synthesis and Field Emission Characteristics of the Amorphous Nano-carbon Films

    Institute of Scientific and Technical Information of China (English)

    袁泽明; 张永强; 姚宁; 张兵临

    2012-01-01

    The amorphous nano-carbon films were synthesized on the crystalline silicon by microwave plasma enhanced chemical vapor deposition ( MPECVD) system. The surface morphology and the structure of the films were tested by scanning electron microscopy (SEM) , Raman scattering spectroscopy and XRD. The field emission characteristics were measured. The results showed that the turn-on field was only 0.39 V/μm, the current density of 3.06 mA/cm2 was obtained when the electric field was 1. 85 V/μm, and the luminous spots were symmetrical, serried and steady. The work function of the films was calculated by an iterative method, which was only 3.1 eV. The emission sites density could reach 1. 7 × 105 cm-2. All these results indicate that the amorphous nano-carbon films are very promising for field emission applications.%采用微波等离子体增强化学气相沉积(MPECVD)法,在涂有FeCl3的硅衬底上制备出了纳米非晶碳薄膜.通 过SEM、XRD和拉曼光谱分析了薄膜材料的形貌和结构.并研究了薄膜材料的场发射特性.结果表明:薄膜的开启电场仅为0.39 V/μm;当电场强度为1.85 V/μm时,电流密度高达3.06 mA/cm2;且场发射点均匀、密集、稳定.迭代法计算表明薄膜材料的功函数为3.1 eV,发射点密度约为1.7×105个/cm2.这些均表明该薄膜是一种性能优良的场发射阴极材料.

  9. Preparation and Thermal Characterization of Diamond-Like Carbon Films

    Institute of Scientific and Technical Information of China (English)

    BAI Su-Yuan; TANG Zhen-An; HUANG Zheng-Xing; Yu Jun; WANG Jing; LIU Gui-Chang

    2009-01-01

    Diamond-like carbon (DLC) films are prepared on silicon substrates by microwave electron cyclotron resonance plasma enhanced chemical vapor deposition. Raman spectroscopy indicates that the films have an amorphous structure and typical characteristics. The topographies of the films are presented by AFM images. Effective thermal conductivities of the films are measured using a nanosecond pulsed photothermal reflectance method. The results show that thermal conductivity is dominated by the microstructure of the films.

  10. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    International Nuclear Information System (INIS)

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature Tp = 270 to 360 °C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at Tp ≥ 330 °C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at Tp ≥ 360 °C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: ► We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. ► The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. ► We investigate basic properties in relation to the pyrolysis temperature. ► Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. ► Microstructure factor, spin density, and photoconductivity show poor quality.

  11. Interfacial electrical properties of ion-beam sputter deposited amorphous carbon on silicon

    Science.gov (United States)

    Khan, A. A.; Woollam, J. A.; Chung, Y.; Banks, B.

    1983-01-01

    Amorphous, 'diamond-like' carbon films have been deposited on Si substrates, using ion-beam sputtering. The interfacial properties are studied using capacitance and conductance measurements. Data are analyzed using existing theories for interfacial electrical properties. The density of electronic states at the interface, along with corresponding time constants are determined.

  12. Crystallization kinetics of amorphous aluminum-tungsten thin films

    Energy Technology Data Exchange (ETDEWEB)

    Car, T.; Radic, N. [Rugjer Boskovic Inst., Zagreb (Croatia). Div. of Mater. Sci.; Ivkov, J. [Institute of Physics, Bijenicka 46, P.O.B. 304, HR-10000 Zagreb (Croatia); Babic, E.; Tonejc, A. [Faculty of Sciences, Physics Department, Bijenicka 32, P.O.B. 162, HR-10000 Zagreb (Croatia)

    1999-01-01

    Crystallization kinetics of the amorphous Al-W thin films under non-isothermal conditions was examined by continuous in situ electrical resistance measurements in vacuum. The estimated crystallization temperature of amorphous films in the composition series of the Al{sub 82}W{sub 18} to Al{sub 62}W{sub 38} compounds ranged from 800 K to 920 K. The activation energy for the crystallization and the Avrami exponent were determined. The results indicated that the crystallization mechanism in films with higher tungsten content was a diffusion-controlled process, whereas in films with the composition similar to the stoichiometric compound (Al{sub 4}W), the interface-controlled crystallization probably occurred. (orig.) With 4 figs., 1 tab., 26 refs.

  13. Recombination of atomic oxygen and hydrogen on amorphous carbon

    International Nuclear Information System (INIS)

    Deposit buildup and fuel entrapment due to amorphous carbon are relevant issues in fusion devices with carbon based plasma facing components. Neutral atomic species play a significant role – atomic hydrogen facilitates the formation of amorphous carbon while atomic oxygen could be used to remove carbon deposits. The kinetics of either reaction depends on the density of neutral species, which in turn is influenced by recombination on the vessel walls. In this work, we measured the probability of heterogeneous recombination of atomic hydrogen and oxygen on amorphous carbon deposits. The recombination coefficients were determined by observing density profiles of atomic species in a closed side-arm of a plasma vessel with amorphous carbon deposit-lined walls. Density profiles were measured with fiber optics catalytic probes. The source of atomic species was inductively coupled radiofrequency plasma. The measured recombination coefficient values were of the order of 10−3 for both species

  14. Photoelectron yield spectroscopy and inverse photoemission spectroscopy evaluations of p-type amorphous silicon carbide films prepared using liquid materials

    Directory of Open Access Journals (Sweden)

    Tatsuya Murakami

    2016-05-01

    Full Text Available Phosphorus-doped amorphous silicon carbide films were prepared using a polymeric precursor solution. Unlike conventional polymeric precursors, this polymer requires neither catalysts nor oxidation for its synthesis and cross-linkage, providing semiconducting properties in the films. The valence and conduction states of resultant films were determined directly through the combination of inverse photoemission spectroscopy and photoelectron yield spectroscopy. The incorporated carbon widened energy gap and optical gap comparably in the films with lower carbon concentrations. In contrast, a large deviation between the energy gap and the optical gap was observed at higher carbon contents because of exponential widening of the band tail.

  15. Influence of dc bias on amorphous carbon deposited by pulse laser ablation

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    Amorphous carbon films were deposited on single-crystalline silicon and K9 glass by pulse laser ablation using different negative substrate bias. Scanning electron microscope (SEM) was used to observe morphology of the surface. Thickness and refractive index of the film deposited on K9 glass were measured by ellipsometry. Micro-hardness of films was measured relatively to single crystal silicon. All films deposited on silicon were analyzed by Raman spectra. All spectra were deconvoluted to three peaks. Line-width ratios varied similarly with bias voltage when the laser energy was kept invariant.

  16. Magnetostriction measurements of amorphous ribbons and thin films

    Science.gov (United States)

    Ouyang, Chien

    The theme of the present work is to measure the saturation magnetostriction constants of amorphous ribbons and thin films. The saturation magnetostriction constants of amorphous ribbons, and thin films of Cosb{39}Nisb{31}Fesb8Sisb8Bsb{14}, CoZrY, and CoZrTb have been measured either by the Small Angle Magnetization Rotation (SAMR) method or by the initial susceptibility method. The SAMR method is used for the soft materials. It is found that the amorphous Cosb{39}Nisb{31}Fesb8Sisb8Bsb{14} prepared by ion beam deposition from an alloy target shows very soft magnetic properties and has a very small negative saturation magnetostriction, lambdasb{s}, of about {-}1×10sp{-7}. Sputtered films of CoZrTb show a strong perpendicular anisotropy when the Tb content is high. We have found that the SAMR method can be applied to CoZrTb films when the Tb content is low. The saturation magnetostriction constant of a sputtered film of Cosb{78.4}Zrsb{20.8}Tbsb{0.8} is 2×10sp{-6}. When the material is not magnetically soft or has a strong perpendicular anisotropy, the initial susceptibility method is used. The saturation magnetostriction constants of amorphous Cosb{77.2}Zrsb{20.4}Tbsb{2.4} and Cosb{72.2}Zrsb{14.6}Ysb{13.2} thin films are 6×10sp{-6}, and (2{˜}6)×10sp{-7}, respectively. The two methods, the SAMR and the initial susceptibility, utilize the same measurement setup making it a very convenient technique which is applicable for a range of materials.

  17. Optical multilayer films based on an amorphous fluoropolymer

    International Nuclear Information System (INIS)

    Multilayered coatings were made by physical vapor deposition (PVD) of a perfluorinated amorphous polymer, Teflon AF2400, and with other optical materials. A high reflector for 1064 nm light was made with ZnS and AF2400. An all-organic 1064 nm reflector was made from AF2400 and polyethylene. Oxide (HfO2 and SiO2) compatibility with AF2400 was also tested. The multilayer morphologies were influenced by coating stress and unintentional temperature rises from the PVD process. Analysis by liquid nuclear magnetic resonance of the thin films showed slight compositional variations between the coating and starting materials of perfluorinated amorphous polymers

  18. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    Energy Technology Data Exchange (ETDEWEB)

    Masuda, Takashi, E-mail: mtakashi@jaist.ac.jp [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Matsuki, Yasuo [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Yokkaichi Research Center, JSR Corporation, 100 Kawajiri-cho, Yokkaichi, Mie, 510-8552 (Japan); Shimoda, Tatsuya [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292 (Japan)

    2012-08-31

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature T{sub p} = 270 to 360 Degree-Sign C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at T{sub p} {>=} 330 Degree-Sign C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at T{sub p} {>=} 360 Degree-Sign C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: Black-Right-Pointing-Pointer We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. Black-Right-Pointing-Pointer The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. Black-Right-Pointing-Pointer We investigate basic properties in relation to the pyrolysis temperature. Black-Right-Pointing-Pointer Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. Black-Right-Pointing-Pointer Microstructure factor, spin density, and photoconductivity show poor quality.

  19. Amorphous Dielectric Thin Films with Extremely Low Mechanical Loss

    Directory of Open Access Journals (Sweden)

    Liu X.

    2015-04-01

    Full Text Available The ubiquitous low-energy excitations are one of the universal phenomena of amorphous solids. These excitations dominate the acoustic, dielectric, and thermal properties of structurally disordered solids. One exception has been a type of hydrogenated amorphous silicon (a-Si:H with 1 at.% H. Using low temperature elastic and thermal measurements of electron-beam evap-orated amorphous silicon (a-Si, we show that TLS can be eliminated in this system as the films become denser and more structurally ordered under certain deposition conditions. Our results demonstrate that TLS are not intrinsic to the glassy state but instead reside in low density regions of the amorphous network. This work obviates the role hydrogen was previously thought to play in removing TLS in a-Si:H and favors an ideal four-fold covalently bonded amorphous structure as the cause for the disappearance of TLS. Our result supports the notion that a-Si can be made a “perfect glass” with “crystal-like” properties, thus offering an encouraging opportunity to use it as a simple crystal dielectric alternative in applications, such as in modern quantum devices where TLS are the source of dissipation, decoherence and 1/f noise.

  20. Amorphous Hafnium-Indium-Zinc Oxide Semiconductor Thin Film Transistors

    Directory of Open Access Journals (Sweden)

    Sheng-Po Chang

    2012-01-01

    Full Text Available We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (α-HfIZO thin film transistors (TFTs. Co-sputtering-processed α-HfIZO thin films have shown an amorphous phase in nature. We could modulate the In, Hf, and Zn components by changing the co-sputtering power. Additionally, the chemical composition of α-HfIZO had a significant effect on reliability, hysteresis, field-effect mobility (μFE, carrier concentration, and subthreshold swing (S of the device. Our results indicated that we could successfully and easily fabricate α-HfIZO TFTs with excellent performance by the co-sputtering process. Co-sputtering-processed α-HfIZO TFTs were fabricated with an on/off current ratio of ~106, higher mobility, and a subthreshold slope as steep as 0.55 V/dec.

  1. Tungsten oxide nanowires grown on amorphous-like tungsten films.

    Science.gov (United States)

    Dellasega, D; Pietralunga, S M; Pezzoli, A; Russo, V; Nasi, L; Conti, C; Vahid, M J; Tagliaferri, A; Passoni, M

    2015-09-11

    Tungsten oxide nanowires have been synthesized by vacuum annealing in the range 500-710 °C from amorphous-like tungsten films, deposited on a Si(100) substrate by pulsed laser deposition (PLD) in the presence of a He background pressure. The oxygen required for the nanowires formation is already adsorbed in the W matrix before annealing, its amount depending on deposition parameters. Nanowire crystalline phase and stoichiometry depend on annealing temperature, ranging from W18O49-Magneli phase to monoclinic WO3. Sufficiently long annealing induces the formation of micrometer-long nanowires, up to 3.6 μm with an aspect ratio up to 90. Oxide nanowire growth appears to be triggered by the crystallization of the underlying amorphous W film, promoting their synthesis at low temperatures. PMID:26292084

  2. Tungsten oxide nanowire synthesis from amorphous-like tungsten films.

    Science.gov (United States)

    Seelaboyina, Raghunandan

    2016-03-18

    A synthesis technique which can lead to direct integration of tungsten oxide nanowires onto silicon chips is essential for preparing various devices. The conversion of amorphous tungsten films deposited on silicon chips by pulsed layer deposition to nanowires by annealing is an apt method in that direction. This perspective discusses the ingenious features of the technique reported by Dellasega et al on the various aspects of tungsten oxide nanowire synthesis. PMID:26871521

  3. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    OpenAIRE

    Masuda, Takashi; Matsuki, Yasuo; Shimoda, Tatsuya

    2012-01-01

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of S...

  4. Amorphous thin film growth: theory compared with experiment

    OpenAIRE

    Raible, M.; Mayr, S. G.; Linz, S. J.; Moske, M.; Hänggi, P.; Samwer, K.

    1999-01-01

    Experimental results on amorphous ZrAlCu thin film growth and the dynamics of the surface morphology as predicted from a minimal nonlinear stochastic deposition equation are analysed and compared. Key points of this study are (i) an estimation procedure for coefficients entering into the growth equation and (ii) a detailed analysis and interpretation of the time evolution of the correlation length and the surface roughness. The results corroborate the usefulness of the deposition equation as ...

  5. Study on stability of hydrogenated amorphous silicon films

    Institute of Scientific and Technical Information of China (English)

    Zhu Xiu-Hong; Chen Guang-Hua; Zhang Wen-Li; Ding Yi; Ma Zhan-Jie; Hu Yue-Hui; He Bin; Rong Yan-Dong

    2005-01-01

    Hydrogenated amorphous silicon (a-Si:H) films with high and same order of magnitude photosensitivity (~105) but different stability were prepared by using microwave electron cyclotron resonance chemical vapour deposition system under the different deposition conditions. It was proposed that there was no direct correlation between the photosensitivity and the hydrogen content (CH) as well as H-Si bonding configurations, but for the stability, they were the critical factors. The experimental results indicated that higher substrate temperature, hydrogen dilution ratio and lower deposition rate played an important role in improving the microstructure of a-Si:H films. We used hydrogen elimination model to explain our experimental results.

  6. Preparation and analysis of amorphous carbon films deposited from (C{sub 6}H{sub 12})/Ar/He chemistry for application as the dry etch hard mask in the semiconductor manufacturing process

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Seungmoo [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Won, Jaihyung; Choi, Jongsik [TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Jang, Samseok [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); Jee, Yeonhong; Lee, Hyeondeok [TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Byun, Dongjin, E-mail: dbyun@korea.ac.kr [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of)

    2011-08-01

    Amorphous carbon layers (ACL) were deposited on Si (100) wafers by plasma enhanced chemical vapor deposition (PECVD) by using 1-hexene (C{sub 6}H{sub 12}) as a carbon source for dry etch hard mask of semiconductor devices manufacturing process. The deposition characteristics and film properties were investigated by means of ellipsometry, Raman spectroscopy, X-ray photo electron spectroscopy (XPS) and stress analysis. Hardness, Young's modulus, and surface roughness of ACL deposited at 550 deg. C were investigated by using nano-indentation and AFM. The deposition rate was decreased from 5050 A/min to 2160 A/min, and dry etch rate was decreased from 2090 A/min to 1770 A/min, and extinction coefficient was increased from 0.1 to 0.5. Raman analysis revealed a higher shift of the G-peak and a lower shift of the D-peak and the increase of I(D)/I(G) ratio as the deposition temperature was increased from 350 deg. C to 550 deg. C. XPS results of ACL deposited at 550 deg. C revealed a carbon 1s binding energy of 284.4 eV. The compressive film stress was decreased from 2.95 GPa to 1.28 GPa with increasing deposition temperature. The hardness and Young's modulus of ACL deposited at 550 deg. C were 5.8 GPa and 48.7 GPa respectively. The surface roughness RMS of ACL deposited at 550 deg. C was 2.24 A, and that after cleaning in diluted HF solution (H{sub 2}O:HF = 200:1), SC1 (NH{sub 4}OH:H{sub 2}O{sub 2}:H{sub 2}O = 1:4:20) solution, and sulfuric acid solution (H{sub 2}SO{sub 4}:H{sub 2}O{sub 2} = 6:1) was 2.28 A, 2.30 A and 7.34 A, respectively. The removal amount of ACL deposited at 550 deg. C in diluted HF solution, SC1 solution and sulfuric acid solution was 6 A, 36 A and 110 A, respectively. These results demonstrated the viability of ACL deposited by PECVD from C{sub 6}H{sub 12} at 550 deg. C for application as the dry etch hard mask in fabrication of semiconductor devices.

  7. Characterization of amorphous and nanocomposite Nb–Si–C thin films deposited by DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Nedfors, Nils, E-mail: nils.nedfors@kemi.uu.se [Department of Chemistry, The Ångström Laboratory, Uppsala University, SE-751 21 Uppsala (Sweden); Tengstrand, Olof [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Flink, Axel [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Impact Coatings AB, Westmansgatan 29, SE-582-16 Linköping (Sweden); Eklund, Per; Hultman, Lars [Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Jansson, Ulf [Department of Chemistry, The Ångström Laboratory, Uppsala University, SE-751 21 Uppsala (Sweden)

    2013-10-31

    Two series of Nb–Si–C thin films of different composition have been deposited using DC magnetron sputtering. In the first series the carbon content was kept at about 55 at.% while the Si/Nb ratio was varied and in the second series the C/Nb ratio was varied instead while the Si content was kept at about 45 at.%. The microstructure is strongly dependent on Si content and Nb–Si–C films containing more than 25 at.% Si exhibit an amorphous structure as determined by X-ray diffraction. Transmission electron microscopy, however, induces crystallisation during analysis, thus obstructing a more detailed analysis of the amorphous structure. X-ray photo-electron spectroscopy suggests that the amorphous films consist of a mixture of chemical bonds such as Nb–Si, Nb–C, and Si–C. The addition of Si results in a hardness decrease from 22 GPa for the binary Nb–C film to 18 – 19 GPa for the Si-containing films, while film resistivity increases from 211 μΩcm to 3215 μΩcm. Comparison with recently published results on DC magnetron sputtered Zr–Si–C films, deposited in the same system using the same Ar-plasma pressure, bias, and a slightly lower substrate temperature (300 °C instead of 350 °C), shows that hardness is primarily dependent on the amount of Si–C bonds rather than type of transition metal. The reduced elastic modulus on the other hand shows a dependency on the type of transition metal for the films. These trends for the mechanical properties suggest that high wear resistant (high H/E and H{sup 3}/E{sup 2} ratio) Me–Si–C films can be achieved by appropriate choice of film composition and transition metal. - Highlights: • Si reduces crystallinity, amorphous structure for films containing > 25 at.% Si. • Electron beam induced crystallization during transmission electron microscopy. • Hardness and resistivity are primarily dependent on the relative amount of C–Si bonds.

  8. Amorphous film thickness dependence for epitaxy of perovskite oxide films under excimer laser irradiation

    International Nuclear Information System (INIS)

    We have studied the epitaxial growth of perovskite manganite LaMnO3 (LMO) on SrTiO3(1 0 0) in the excimer laser assisted metal organic deposition process. The LMO was preferentially grown from the substrate surface by the KrF laser irradiation. The study of amorphous LMO film thickness dependence on epitaxial growth under the excimer laser irradiation revealed that the photo-thermal heating effect strongly depended on the amorphous film thickness due to a low thermal conductivity of amorphous LMO: the ion-migration for chemical bond-forming at the reaction interface would be strongly enhanced in the amorphous LMO film with the large film thickness about 210 nm. On the other hand, the photo-chemical effect occurred efficiently for the amorphous film thickness in the range of 35-210 nm. These results indicate that the epitaxial growing rate was dominated by the photo-thermal heating after the photo-chemical activation at the growth interface.

  9. Carbon nanotube-amorphous silicon hybrid solar cell with improved conversion efficiency

    Science.gov (United States)

    Funde, Adinath M.; Nasibulin, Albert G.; Gufran Syed, Hashmi; Anisimov, Anton S.; Tsapenko, Alexey; Lund, Peter; Santos, J. D.; Torres, I.; Gandía, J. J.; Cárabe, J.; Rozenberg, A. D.; Levitsky, Igor A.

    2016-05-01

    We report a hybrid solar cell based on single walled carbon nanotubes (SWNTs) interfaced with amorphous silicon (a-Si). The high quality carbon nanotube network was dry transferred onto intrinsic a-Si forming Schottky junction for metallic SWNT bundles and heterojunctions for semiconducting SWNT bundles. The nanotube chemical doping and a-Si surface treatment minimized the hysteresis effect in current-voltage characteristics allowing an increase in the conversion efficiency to 1.5% under an air mass 1.5 solar spectrum simulator. We demonstrated that the thin SWNT film is able to replace a simultaneously p-doped a-Si layer and transparent conductive electrode in conventional amorphous silicon thin film photovoltaics.

  10. Carbon nanotube-amorphous silicon hybrid solar cell with improved conversion efficiency.

    Science.gov (United States)

    Funde, Adinath M; Nasibulin, Albert G; Syed, Hashmi Gufran; Anisimov, Anton S; Tsapenko, Alexey; Lund, Peter; Santos, J D; Torres, I; Gandía, J J; Cárabe, J; Rozenberg, A D; Levitsky, Igor A

    2016-05-01

    We report a hybrid solar cell based on single walled carbon nanotubes (SWNTs) interfaced with amorphous silicon (a-Si). The high quality carbon nanotube network was dry transferred onto intrinsic a-Si forming Schottky junction for metallic SWNT bundles and heterojunctions for semiconducting SWNT bundles. The nanotube chemical doping and a-Si surface treatment minimized the hysteresis effect in current-voltage characteristics allowing an increase in the conversion efficiency to 1.5% under an air mass 1.5 solar spectrum simulator. We demonstrated that the thin SWNT film is able to replace a simultaneously p-doped a-Si layer and transparent conductive electrode in conventional amorphous silicon thin film photovoltaics. PMID:27005494

  11. Low-temperature internal friction in quenched amorphous selenium films

    Science.gov (United States)

    Metcalf, Thomas; Liu, Xiao; Abernathy, Matthew; Stephens, Richard

    Using ultra-high-quality-factor silicon mechanical resonators, we have measured the internal friction and shear modulus of amorphous selenium (a-Se) films at liquid helium temperatures. The glass transition temperature of selenium lies at a conveniently accessible 40 -50° C, facilitating a series of in- and ex-situ annealing and quench cycles. The a-Se films exhibit the low-temperature internal friction plateau (10-4 amorphous solids, which is a result of (and direct measure of) a broad distribution of two-level tunneling systems (TLS), whose origin is still unknown. We find a clear correlation between the post-anneal quench rate and the value of this plateau. The implications of these observations for understanding the microscopic origin of TLS will be discussed. Principally, the observed changes in the internal friction plateau could show the way in which the density of TLS could be manipulated or suppressed in other amorphous systems. Work supported by the Office of Naval Research and the University of Pennsylvania Materials Research Science and Engineering Center.

  12. Photoluminescence and Raman Spectroscopy Studies of Carbon Nitride Films

    OpenAIRE

    Hernández-Torres, J.; Gutierrez-Franco, A.; P. G. González; L. García-González; Hernandez-Quiroz, T.; Zamora-Peredo, L.; V.H. Méndez-García; A. Cisneros-de la Rosa

    2016-01-01

    Amorphous carbon nitride films with N/C ratios ranging from 2.24 to 3.26 were deposited by reactive sputtering at room temperature on corning glass, silicon, and quartz as substrates. The average chemical composition of the films was obtained from the semiquantitative energy dispersive spectroscopy analysis. Photoluminescence measurements were performed to determine the optical band gap of the films. The photoluminescence spectra displayed two peaks: one associated with the substrate and the ...

  13. Elimination of residual stress in hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Jones, P.L.; Korhonen, A.S.; Dimmey, L.J.; Cocks, F.H.; Pollock, J.T.A.

    1982-02-01

    Residual stresses were measured in hydrogenated amorphous silicon films produced by glow discharge decomposition of silane and deposited onto aluminium, Invar (36Ni-64Fe), copper and nickel substrates. The substrate temperatures were in the range 54-295/sup 0/C during deposition. For low deposition temperatures, all films irrespective of substrate exhibited compressive room temperature residual stresses ranging from -60 to -120 mPa. A major fraction of this residual stress is found to come from the intrinsic deposition stress, which has complex origins relating to deposition and substrate conditions. With aluminium substrates, increasing the deposition temperature increased the compressive residual stress, primarily because of the difference between the thermal expansion coefficients of silicon and aluminium. However, with Invar substrates, films deposited at 225/sup 0/C exhibited a zero residual stress at room temperature because of a balancing of the compressive intrinsic deposition stress with the tensile stress produced during cooling by the low thermal expansion of the Invar.

  14. Determination of Chemical Bond of Tetrahedral Amorphous Carbon Films by Ellipsometry Approach%椭偏法表征四面体非晶碳薄膜的化学键结构

    Institute of Scientific and Technical Information of China (English)

    李晓伟; 周毅; 孙丽丽; 汪爱英

    2012-01-01

    Tetrahedral amorphous carbon (ta-C) films under different substrate negative bias are prepared by a home developed filtered cathodic vacuum arc (FCVA) technology with double bend shape. The film thickness is measured by a combined spectrophotometry and spectroscopic ellipsometry (SE) approach; the chemical bonds including sp2C and sp3C are gained by the fitted ellipsometry method. Furthermore,the accuracy of ellipsometry results is evaluated by comparing with those of X-ray photoelectron spectroscopy (XPS) and Raman spectra. The results indicate that the minimum thickness of ta-C film of 33. 9 nm is obtained when the bias voltage is -100 V; with the increase of bias voltage,the optical gaps and the content of sp3C atomic bond decrease,while the sp2C content increases correspondingly. By comparison with the results of XPS and Raman spectra,it is found that when the optical constants of sp2C model are represented by the glassy carbon and the fitting wavelength ranges are chosen from 250 to 1700 nm,the best fitting result of atomic bonds of ta-C films can be deduced by the ellipsometry method. Therefore,it could be said that the elliposometry method is a quite promising method to characterize the atomic bonds of ta-C films including sp2C and sp3C,as a new nondestructive,fast,quantitative and easy way.%采用自主研制的双弯曲磁过滤阴极真空电弧(FCVA)技术,在不同衬底负偏压下制备了四面体非晶碳(ta-C)薄膜.通过分光光度计和椭偏(SE)联用技术精确测量了薄膜厚度,重点采用椭偏法对不同偏压下制备的ta-C薄膜sp3C键和sp2C键结构进行了拟合表征,并与X射线光电子能谱(XPS)和拉曼光谱的实验结果相对比,分析了非晶碳结构的椭偏拟合新方法可靠性.结果表明,在-100 V偏压时薄膜厚度最小,为33.9 nm;随着偏压的增加,薄膜中的sp2C含量增加,sp3C含量减小,光学带隙下降.对比结果发现,椭偏法作为一种无损、简易、快速的表征

  15. Fracture of Carbon Nanotube - Amorphous Carbon Composites: Molecular Modeling

    Science.gov (United States)

    Jensen, Benjamin D.; Wise, Kristopher E.; Odegard, Gregory M.

    2015-01-01

    Carbon nanotubes (CNTs) are promising candidates for use as reinforcements in next generation structural composite materials because of their extremely high specific stiffness and strength. They cannot, however, be viewed as simple replacements for carbon fibers because there are key differences between these materials in areas such as handling, processing, and matrix design. It is impossible to know for certain that CNT composites will represent a significant advance over carbon fiber composites before these various factors have been optimized, which is an extremely costly and time intensive process. This work attempts to place an upper bound on CNT composite mechanical properties by performing molecular dynamics simulations on idealized model systems with a reactive forcefield that permits modeling of both elastic deformations and fracture. Amorphous carbon (AC) was chosen for the matrix material in this work because of its structural simplicity and physical compatibility with the CNT fillers. It is also much stiffer and stronger than typical engineering polymer matrices. Three different arrangements of CNTs in the simulation cell have been investigated: a single-wall nanotube (SWNT) array, a multi-wall nanotube (MWNT) array, and a SWNT bundle system. The SWNT and MWNT array systems are clearly idealizations, but the SWNT bundle system is a step closer to real systems in which individual tubes aggregate into large assemblies. The effect of chemical crosslinking on composite properties is modeled by adding bonds between the CNTs and AC. The balance between weakening the CNTs and improving fiber-matrix load transfer is explored by systematically varying the extent of crosslinking. It is, of course, impossible to capture the full range of deformation and fracture processes that occur in real materials with even the largest atomistic molecular dynamics simulations. With this limitation in mind, the simulation results reported here provide a plausible upper limit on

  16. Chromic mechanism in amorphous WO{sub 3} films

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, J G; Benson, D K; Tracy, C E; Deb, S K; Czanderna, A W [National Renewable Energy Lab., Golden, CO (United States); Bechinger, C [Universitaet Konstanz (Germany)

    1996-11-01

    The authors propose a new model for the chromic mechanism in amorphous tungsten oxide films (WO{sub 3{minus}y}{center_dot}nH{sub 2}O). This model not only explains a variety of seemingly conflicting experimental results reported in the literature that cannot be explained by existing models, it also has practical implications with respect to improving the coloring efficiency and durability of electrochromic devices. According to this model, a typical as-deposited tungsten oxide film has tungsten mainly in W{sup 6+} and W{sup 4+} states and can be represented as W{sub 1{minus}y}{sup 6+} W{sub y}{sup 4+}O{sub 3{minus}y}{center_dot}nH{sub 2}O. The proposed chromic mechanism is based on the small polaron transition between the charge-induced W{sup 5+} state and the original W{sup 4+} state instead of the W{sup 5+} and W{sup 6+} states as suggested in previous models. The correlation between the electrochromic and photochromic behavior in amorphous tungsten oxide films is also discussed.

  17. Prospective crystallization of amorphous Si films for new Si TFTs

    Energy Technology Data Exchange (ETDEWEB)

    Noguchi, Takashi [University of the Ryukyus, Fuculty of Engineering, Nishihara, Okinawa (Japan)

    2008-07-01

    Prospective crystallization results of amorphous silicon film are reviewed and are discussed. Silicon TFTs are playing an important role for Active-Matrix Flat Panel Displays (AM-FPD) based on amorphous or poly-Si thin-film transistors (TFTs). Poly-Si TFTs provide a possibility to develop highly functional system on pane (SoP) applications. In order to get a high performance TFT, large poly-crystal grains or high cystallinity for the film is required. Two basic crystallization techniques namely solid phase crystallization (SPC) and excimer laser crystallization (ELC) are reviewed and relating issues are described. A grain growth technique has been developed based on the two crystallization techniques, so far. In order to mount a poly-Si TFT system on a flexible panel such as a plastic, an excimer laser of UV pulse beam has an advantage for the TFT channel as well as for the source and drain contacts as a ultra-low temperature poly-Si (U-LTPS) process. To realize a high performance TFT of uniform and high carrier mobility, location control crystallization had been proposed. Some of the distinctive results for crystal orientation control of (100) and (111) face using the laser crystallization techniques are described. In the future, single-crystalline Si TFT of a functional 3D structure is expected to realize an advanced SoP for ubiquitous electronics era. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  18. Reaction of amorphous Ni-W and Ni-N-W films with substrate silicon

    Science.gov (United States)

    Zhu, M. F.; Suni, I.; Nicolet, M.-A.; Sands, T.

    1984-01-01

    Wiley et al. (1982) have studied sputtered amorphous films of Nb-Ni, Mo-Ni, Si-W, and Si-Mo. Kung et al. (1984) have found that amorphous Ni-Mo films as diffusion barriers between multilayer metallizations on silicon demonstrate good electrical and thermal stability. In the present investigation, the Ni-W system was selected because it is similar to the Ni-Mo system. However, W has a higher silicide formation temperature than Mo. Attention is given to aspects of sample preparation, sample characterization, the interaction between amorphous Ni-W films and Si, the crystallization of amorphous Ni(36)W(64) films on SiO2, amorphous Ni-N-W films, silicide formation and phase separation, and the crystallization of amorphous Ni(36)W(64) and Ni(30)N(21)W(49) layers.

  19. Optical properties of amorphous carbons and their applications and perspectives in photonics

    Energy Technology Data Exchange (ETDEWEB)

    Patsalas, P., E-mail: ppats@cc.uoi.g

    2011-04-01

    Amorphous carbon exhibits a wide variety of optical properties and, thus, offers substantial opportunities for various applications in photonics. The main optical properties, which should be taken into account for the design of new photonic devices, are the refractive index n, the fundamental gap E{sub g} and the E{sub 04} gap. In this work, the optical properties of the various forms of amorphous carbon films grown by plasma-enhanced chemical vapor deposition, pulsed laser deposition, sputtering and vacuum cathodic arc deposition and the crucial structural and chemical factors that determine n, E{sub g}, and E{sub 04} are reviewed. The knowledge of the optical properties of such films is exploited in order to design and implement various photonic devices such as: 1) anti-reflection (AR) coatings for various uses including photovoltaic modules, 2) interferometric sensors and indicators based on carbon-based AR layers, and 3) laser patterning of amorphous carbons and study of its photosensitivity for holographic applications.

  20. Superconductivity and unusual magnetic behavior in amorphous carbon

    Science.gov (United States)

    Felner, Israel

    2014-03-01

    Traces of superconductivity (SC) at elevated temperatures (up to 65 K) were observed by magnetic measurements in three different inhomogeneous sulfur doped amorphous carbon (a-C) systems: (a) in commercial and (b) synthesized powders and (c) in a-C thin films. (a) Studies performed on a commercial (a-C) powder, which contains 0.21% sulfur, revealed traces of non-percolated superconducting phases below T c = 65 K. The SC volume fraction is enhanced by the sulfur doping. (b) The a-C powder obtained by pyrolytic decomposition of sucrose did not show any sign of SC above 5 K. This powder was mixed with sulfur and synthesized at 400 °C (a-CS). The inhomogeneous products obtained show traces of SC phases at T c = 17 and 42 K. (c) Non-superconducting composite a-C-W thin films were grown by electron-beam induced deposition. SC emerged at T c = 34.4 K only after heat treatment with sulfur. Other parts of the pyrolytic a-CS powder show unusual magnetic features. (i) Pronounced irreversible peaks around 55-75 K appear in the first zero-field-cooled (ZFC) sweep only. Their origin is not known. (ii) Unexpectedly, these peaks are totally suppressed in the second ZFC runs measured a few minutes later. (iii) Around the peak position the field-cooled (FC) curves cross the ZFC plots (ZFC > FC). These peculiar magnetic observations are also ascribed to an a-CS powder prepared from the commercial a-C powder and are connected to each other. All SC and magnetic phenomena observed are intrinsic properties of the sulfur doped a-C materials. It is proposed that the a-CS systems behave similarly to well-known high T c curates and/or pnictides in which SC emerges from magnetic states.

  1. Superconductivity and unusual magnetic behavior in amorphous carbon

    International Nuclear Information System (INIS)

    Traces of superconductivity (SC) at elevated temperatures (up to 65 K) were observed by magnetic measurements in three different inhomogeneous sulfur doped amorphous carbon (a-C) systems: (a) in commercial and (b) synthesized powders and (c) in a-C thin films. (a) Studies performed on a commercial (a-C) powder, which contains 0.21% sulfur, revealed traces of non-percolated superconducting phases below T c = 65 K. The SC volume fraction is enhanced by the sulfur doping. (b) The a-C powder obtained by pyrolytic decomposition of sucrose did not show any sign of SC above 5 K. This powder was mixed with sulfur and synthesized at 400 °C (a-CS). The inhomogeneous products obtained show traces of SC phases at T c = 17 and 42 K. (c) Non-superconducting composite a-C-W thin films were grown by electron-beam induced deposition. SC emerged at T c = 34.4 K only after heat treatment with sulfur. Other parts of the pyrolytic a-CS powder show unusual magnetic features. (i) Pronounced irreversible peaks around 55–75 K appear in the first zero-field-cooled (ZFC) sweep only. Their origin is not known. (ii) Unexpectedly, these peaks are totally suppressed in the second ZFC runs measured a few minutes later. (iii) Around the peak position the field-cooled (FC) curves cross the ZFC plots (ZFC > FC). These peculiar magnetic observations are also ascribed to an a-CS powder prepared from the commercial a-C powder and are connected to each other. All SC and magnetic phenomena observed are intrinsic properties of the sulfur doped a-C materials. It is proposed that the a-CS systems behave similarly to well-known high T c curates and/or pnictides in which SC emerges from magnetic states. (papers)

  2. Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc

    Science.gov (United States)

    Lin, Yu-Hung; Syue, Yang-Chih; Lin, Hong-Da; Chen, Uei-Shin; Chang, Yee-Shyi; Chen, Jiann-Ruey; Shih, Han C.

    2008-12-01

    Fluorine-doped amorphous carbon (a-C:F) films were deposited using a 90°-bend magnetic filtered cathodic arc plasma system with CF 4 as a precursor and the addition of argon gas. The microstructure, composition and chemical bonding nature of the a-C:F films were investigated by Raman scattering spectroscopy and X-ray photoelectron spectroscopy. The surface morphology and roughness of a-C:F films were observed through an atomic force microscope. Hardness was measured by nano-indentation. Water contact angles were measured by the sessile drop method. The fluorine content of the films increases with the argon flux. Because of the increase of the fluorine content in the films, the film surface becomes rougher; the hardness decreases, and the contact angle increases from 76.2° to 87.8°. This work demonstrates that an appropriate amount of the admitted argon to the plasma would promote the doping of the films with fluorine, and influences the properties of the a-C:F films.

  3. Pyrolyzed carbon film diodes.

    Science.gov (United States)

    Morton, Kirstin C; Tokuhisa, Hideo; Baker, Lane A

    2013-11-13

    We have previously reported pyrolyzed parylene C (PPC) as a conductive carbon electrode material for use with micropipets, atomic force microscopy probes, and planar electrodes. Advantages of carbon electrode fabrication from PPC include conformal coating of high-aspect ratio micro/nanoscale features and the benefits afforded by chemical vapor deposition of carbon polymers. In this work, we demonstrate chemical surface doping of PPC through the use of previously reported methods. Chemically treated PPC films are characterized by multiple spectroscopic and electronic measurements. Pyrolyzed parylene C and doped PPC are used to construct diodes that are examined as both p-n heterojunction and Schottky barrier diodes. Half-wave rectification is achieved with PPC diodes and demonstrates the applicability of PPC as a conductive and semiconductive material in device fabrication. PMID:24090451

  4. Optical limiting in hydrogenated amorphous silicon-selenium thin films

    Energy Technology Data Exchange (ETDEWEB)

    Manaa, Hacene, E-mail: hmanaa@gmail.co [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Mulla, Abdullah; Al-Jamal, Noor [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Dallal, Shawqi; Al-Alawi, Saleh [Physics Department, University of Bahrain, P.O. Box 32038 (Bahrain)

    2010-05-03

    Hydrogenated amorphous silicon-selenium alloy thin films grown by capacitively coupled radio-frequency glow-discharge are investigated. Nonlinear absorptive effects are evaluated with the help of open aperture z-scan technique in the 525 to 580 nm spectral range. The nonlinear absorption coefficient is found to be very large and reaching the value of 5.14 x 10{sup -3} cm/W at 525 nm. The origin of the optical nonlinearities is studied and found to be due mainly to two photon absorption in the case of pulsed excitation, whereas thermal effects are thought to be dominant when the sample is excited with a continuous wave laser. Optical limiting potentialities of the thin film are experimentally observed and their thresholds are found to be very low.

  5. Understanding the Structure of Amorphous Thin Film Hafnia - Final Paper

    Energy Technology Data Exchange (ETDEWEB)

    Miranda, Andre [SLAC National Accelerator Lab., Menlo Park, CA (United States)

    2015-08-27

    Hafnium Oxide (HfO2) amorphous thin films are being used as gate oxides in transistors because of their high dielectric constant (κ) over Silicon Dioxide. The present study looks to find the atomic structure of HfO2 thin films which hasn’t been done with the technique of this study. In this study, two HfO2 samples were studied. One sample was made with thermal atomic layer deposition (ALD) on top of a Chromium and Gold layer on a silicon wafer. The second sample was made with plasma ALD on top of a Chromium and Gold layer on a Silicon wafer. Both films were deposited at a thickness of 50nm. To obtain atomic structure information, Grazing Incidence X-ray diffraction (GIXRD) was carried out on the HfO2 samples. Because of this, absorption, footprint, polarization, and dead time corrections were applied to the scattering intensity data collected. The scattering curves displayed a difference in structure between the ALD processes. The plasma ALD sample showed the broad peak characteristic of an amorphous structure whereas the thermal ALD sample showed an amorphous structure with characteristics of crystalline materials. This appears to suggest that the thermal process results in a mostly amorphous material with crystallites within. Further, the scattering intensity data was used to calculate a pair distribution function (PDF) to show more atomic structure. The PDF showed atom distances in the plasma ALD sample had structure up to 10 Å, while the thermal ALD sample showed the same structure below 10 Å. This structure that shows up below 10 Å matches the bond distances of HfO2 published in literature. The PDF for the thermal ALD sample also showed peaks up to 20 Å, suggesting repeating atomic spacing outside the HfO2 molecule in the sample. This appears to suggest that there is some crystalline structure within the thermal ALD sample.

  6. Photoinduced effects in amorphous semiconductor Ge(S, Se)2 chalcogenide films

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    The blue shift of optical transmittance edges were observed in amorphous semiconductor Ge(S, Se)2 chalcogenide films with light illumination. The shift in well-annealed films could be recovered by annealing the films near the glass-transition temperature again. The photocrystallization was also observed in amorphous Ge(S,Se)2 films with light illumination by the transmitting electron microscope measurement. The photoinduced phenomina of the amorphous Ge(S,Se)2 films could be applied to designing some new kinds of optical storage materials.

  7. Modeling of amorphous carbon structures with arbitrary structural constraints.

    Science.gov (United States)

    Jornada, F H; Gava, V; Martinotto, A L; Cassol, L A; Perottoni, C A

    2010-10-01

    In this paper we describe a method to generate amorphous structures with arbitrary structural constraints. This method employs the simulated annealing algorithm to minimize a simple yet carefully tailored cost function (CF). The cost function is composed of two parts: a simple harmonic approximation for the energy-related terms and a cost that penalizes configurations that do not have atoms in the desired coordinations. Using this approach, we generated a set of amorphous carbon structures spawning nearly all the possible combinations of sp, sp(2) and sp(3) hybridizations. The bulk moduli of this set of amorphous carbons structures was calculated using Brenner's potential. The bulk modulus strongly depends on the mean coordination, following a power-law behavior with an exponent ν = 1.51 ± 0.17. A modified cost function that segregates carbon with different hybridizations is also presented, and another set of structures was generated. With this new set of amorphous materials, the correlation between the bulk modulus and the mean coordination weakens. The method proposed can be easily modified to explore the effects on the physical properties of the presence of hydrogen, dangling bonds, and structural features such as carbon rings.

  8. Physical–chemical and biological behavior of an amorphous calcium phosphate thin film produced by RF-magnetron sputtering

    International Nuclear Information System (INIS)

    This work evaluates the thermal reactivity and the biological reactivity of an amorphous calcium phosphate thin film produced by radio frequency (RF) magnetron sputtering onto titanium substrates. The analyses showed that the sputtering conditions used in this work led to the deposition of an amorphous calcium phosphate. The thermal treatment of this amorphous coating in the presence of H2O and CO2 promoted the formation of a carbonated HA crystalline coating with the entrance of CO32− ions into the hydroxyl HA lattice. When immersed in culture medium, the amorphous and carbonated coatings exhibited a remarkable instability. The presence of proteins increased the dissolution process, which was confirmed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Moreover, the carbonated HA coating induced precipitation independently of the presence of proteins under dynamic conditions. Despite this surface instability, this reactive calcium phosphate significantly improved the cellular behavior. The cell proliferation was higher on the Ticp than on the calcium phosphate coatings, but the two coatings increased cellular spreading and stress fiber formation. In this sense, the presence of reactive calcium phosphate coatings can stimulate cellular behavior. - Highlights: ► Functionalization of Ti with reactive CaP thin film by RF-magnetron sputtering. ► De-hydroxylation facilitating the insertion of CO32− into the HA lattice. ► High surface reactivity in the presence of culture medium. ► Cell behavior improved by the presence of reactive films.

  9. Low-Temperature Annealing Induced Amorphization in Nanocrystalline NiW Alloy Films

    Directory of Open Access Journals (Sweden)

    Z. Q. Chen

    2013-01-01

    Full Text Available Annealing induced amorphization in sputtered glass-forming thin films was generally observed in the supercooled liquid region. Based on X-ray diffraction and transmission electron microscope (TEM analysis, however, here, we demonstrate that nearly full amorphization could occur in nanocrystalline (NC sputtered NiW alloy films annealed at relatively low temperature. Whilst the supersaturation of W content caused by the formation of Ni4W phase played a crucial role in the amorphization process of NiW alloy films annealed at 473 K for 30 min, nearly full amorphization occurred upon further annealing of the film for 60 min. The redistribution of free volume from amorphous regions into crystalline regions was proposed as the possible mechanism underlying the nearly full amorphization observed in NiW alloys.

  10. First-principles studies of the vibrational properties of amorphous carbon nitrides

    Institute of Scientific and Technical Information of China (English)

    Niu Li; Wang Xuan-Zhang; Zhu Jia-Qi; Gao Wei

    2013-01-01

    Raman spectra of amorphous carbon nitride films (a-C:N) resemble those of typical amorphous carbon (a-C),and no specific features in the spectra are shown due to N doping.The present work provides a correlation between the microstructure and vibrational properties of a-C:N films from first principles.The six periodic model structures of 64 atoms with various mass densities and nitrogen contents are generated by the liquid-quench method using Car-Parinello molecular dynamics.By using Raman coupling tensors calculated with the finite electric field method,Raman spectra are obtained.The calculated results show that the vibrations of C=N could directly contribute to the Raman spectrum.The similarity of the Raman line shapes of N-doped and N-free amorphous carbons is due to the overlapping of C=N and C=C vibration bands.In addition,the origin of characteristic Raman peaks is also given.

  11. Understanding the hydrogen and oxygen gas pressure dependence of the tribological properties of silicon oxide-doped hydrogenated amorphous carbon coatings

    OpenAIRE

    Koshigan, KD; Mangolini, F; McClimon, JB; Vacher, B.; Bec, S; Carpick, RW; Fontaine, J

    2015-01-01

    Silicon oxide-doped hydrogenated amorphous carbons (a–C:H:Si:O) are amorphous thin films used as solid lubricants in a range of commercial applications, thanks to its increased stability in extreme environments, relative to amorphous hydrogenated carbons (a–C:H). This work aims to develop a fundamental understanding of the environmental impact on the tribology of a–C:H:Si:O. Upon sliding an a–C:H:Si:O film against a steel counterbody, two friction regimes develop: high friction in high vacuum...

  12. High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.

    Science.gov (United States)

    He, Rongrui; Day, Todd D; Sparks, Justin R; Sullivan, Nichole F; Badding, John V

    2016-07-01

    Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors. PMID:27174318

  13. Electronic properties of intrinsic and doped amorphous silicon carbide films

    Energy Technology Data Exchange (ETDEWEB)

    Vetter, M. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)]. E-mail: mvetter@eel.upc.edu; Voz, C. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Ferre, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Martin, I. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Orpella, A. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Puigdollers, J. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Andreu, J. [Departament de Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, E-08028 Barcelona (Spain); Alcubilla, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)

    2006-07-26

    Hydrogenated amorphous silicon carbide (a-SiC{sub x} : H) films have shown excellent surface passivation of crystalline silicon. With the aim of large area deposition of these films the influence of the rf plasma power was investigated. It is found that homogenous deposition with effective surface recombination velocity lower than 100 cms{sup -1} is possible up to 6'' diameter in a simple parallel plate reactor by optimizing deposition parameters. For application in solar cell processes the conductivity of these a-SiC{sub x} : H films might become of importance since good surface passivation results from field-effect passivation which needs an insulating dielectric layer. Therefore, the temperature dependence of the dark dc conductivity of these films was investigated in the temperature range from - 20 to 260 deg. C. Two transition temperatures, T {sub s}{approx}80 deg. C and T {sub s}{approx}170 deg. C, were found where conductivity increases, resp. decreases over-exponential. From Arrhenius plots activation energy (E {sub a}) and conductivity pre-factor ({sigma} {sub 0}) were calculated for a large number of samples with different composition. A correlation between E {sub a} and {sigma} {sub 0} was found giving a Meyer-Neldel relation with a slope of 59 mV, corresponding to a material characteristic temperature T {sub m} = 400 deg. C, and an intercept at {sigma} {sub 00} = 0.1 {omega}{sup -1}cm{sup -1}.

  14. Amorphous carbon contamination monitoring and process optimization for single-walled carbon nanotube integration

    International Nuclear Information System (INIS)

    We detail the monitoring of amorphous carbon deposition during thermal chemical vapour deposition of carbon nanotubes and propose a contamination-less process to integrate high-quality single-walled carbon nanotubes into micro-electromechanical systems. The amorphous content is evaluated by confocal micro-Raman spectroscopy and by scanning/transmission electron microscopy. We show how properly chosen process parameters can lead to successful integration of single-walled nanotubes, enabling nano-electromechanical system synthesis

  15. Low-emissivity coating of amorphous diamond-like carbon/Ag-alloy multilayer on glass

    International Nuclear Information System (INIS)

    Transparent low-emissivity (low-e) coatings comprising dielectrics of amorphous diamond-like carbon (DLC) and Ag-alloy films are investigated. All films have been prepared by dc magnetron sputtering. An index of refraction of the DLC film deposited in a gas mixture of Ar/H2 (4%) shows n = 1.80 + 0.047i at 500 nm wavelength. A multilayer stack of DLC (70 nm thick)/Ag87.5Cu12.5-alloy (10 nm)/DLC (140 nm)/Ag87.5Cu12.5-alloy (10 nm)/DLC (70 nm) has revealed clear interference spectra with spectra selectivity. This coating performs low emittance less than 0.1 for black body radiation at 297 K, exhibiting a transparent heat mirror property embedded in DLC films

  16. Sizeable magnetic circular dichroism of artificially precipitated Co clusters in amorphous carbon

    Directory of Open Access Journals (Sweden)

    H. S. Hsu

    2012-09-01

    Full Text Available This study examines sizeable magnetic circular dichroism (MCD in Co(20%-doped amorphous carbon (a-C films. While as-grown films exhibit a non-detectable MCD signal, films that undergo rapid thermal annealing (RTA at 600°C in a vacuum yield broad MCD spectra with a large amplitude of ∼3.9 × 104 deg/cm in saturation field 0.78 T at the σ-σ* gap transition (∼5.5 eV. In such films after RTA, the metastable Co-C bonding is decomposed and suitable Co nanoparticles/a-C interfaces are thus formed. Our results indicate that the large change in MCD is contributed from Co nanoparticles and associated with the spin-dependent electronic structure at the Co/a-C interfaces.

  17. Nanotribological performance of fullerene-like carbon nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Flores-Ruiz, Francisco Javier; Enriquez-Flores, Christian Ivan [Centro de Investigación y Estudios Avanzados (CINVESTAV) IPN, Unidad Querétaro, Lib. Norponiente 2000, Real de Juriquilla, C.P. 76230, Querétaro, Qro., México (Mexico); Chiñas-Castillo, Fernando, E-mail: fernandochinas@gmail.com [Department of Mechanical Engineering, Instituto Tecnológico de Oaxaca, Oaxaca, Oax. Calz. Tecnológico No. 125, CP. 68030, Oaxaca, Oax. (Mexico); Espinoza-Beltrán, Francisco Javier [Centro de Investigación y Estudios Avanzados (CINVESTAV) IPN, Unidad Querétaro, Lib. Norponiente 2000, Real de Juriquilla, C.P. 76230, Querétaro, Qro., México (Mexico)

    2014-09-30

    Highlights: • Fullerene-like CNx samples show an elastic recovery of 92.5% and 94.5% while amorphous CNx samples had only 75% elastic recovery. • Fullerene-like CNx films show an increment of 34.86% and 50.57% in fractions of C 1s and N 1s. • Fullerene-like CNx samples show a lower friction coefficient compared to amorphous CNx samples. • Friction reduction characteristics of fullerene-like CNx films are strongly related to the increase of sp{sup 3} CN bonds. - Abstract: Fullerene-like carbon nitride films exhibit high elastic modulus and low friction coefficient. In this study, thin CNx films were deposited on silicon substrate by DC magnetron sputtering and the tribological behavior at nanoscale was evaluated using an atomic force microscope. Results show that CNx films with fullerene-like structure have a friction coefficient (CoF ∼ 0.009–0.022) that is lower than amorphous CNx films (CoF ∼ 0.028–0.032). Analysis of specimens characterized by X-ray photoelectron spectroscopy shows that films with fullerene-like structure have a higher number of sp{sup 3} CN bonds and exhibit the best mechanical properties with high values of elastic modulus (E > 180 GPa) and hardness (H > 20 GPa). The elastic recovery determined on specimens with a fullerene-like CNx structure was of 95% while specimens of amorphous CNx structure had only 75% elastic recovery.

  18. Amorphous grain boundary layers in the ferromagnetic nanograined ZnO films

    International Nuclear Information System (INIS)

    Pure ZnO thin films were obtained by the wet chemistry (“liquid ceramics”) method from the butanoate precursors. Films consist of dense equiaxial nanograins and reveal ferromagnetic behaviour. The structure of the ZnO films was studied by the high-resolution transmission electron microscopy. The intergranular regions in the nanograined ZnO films obtained by the “liquid ceramics” method are amorphous. It looks like fine areas of the second amorphous phase which wets (covers) some of the ZnO/ZnO grain boundaries. Most probably these amorphous intergranular regions contain the defects which are responsible for the ferromagnetic behaviour.

  19. Effects of oxygen stoichiometry on electrochromic properties in amorphous tungsten oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Inamdar, Akbar I.; Kim, Y.S.; Jang, B.U. [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Im, Hyunsik, E-mail: hyunsik7@dongguk.edu [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Jung, Woong [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Kim, Dae-Young [Department of Biological and Environmental Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Kim, Hyungsang [Department of Physics, Dongguk University, Seoul 100-715 (Korea, Republic of)

    2012-06-01

    We have investigated the electrochromic properties of amorphous granular tungsten oxide (WO{sub 3+{delta}}) thin films with over-stoichiometric oxygen content ({delta}), using LiClO{sub 4} with propylene carbonate as an electrolyte. Different optical and electrochromic characteristics are observed with increasing {delta}. All the devices are electrochemically stable for more than 5000 color/bleach cycles without apparent degradation, and they have a faster response to coloration than to bleaching. WO{sub 3+{delta}} films with an optimized {delta} value show an optical modulation of 86% at a wavelength of 630 nm and the highest coloration efficiency ever reported of {approx} 213 cm{sup 2}/C. The {delta}-dependent coloration mechanism is discussed using the site saturation model. It is proposed that WO{sub 3+{delta}} films with the optimal {delta} value have favorable thickness and stoichiometry for the generation of Li{sup +}W{sup +5} states. - Highlights: Black-Right-Pointing-Pointer We report on electrochromic characteristics in WO{sub 3+{delta}} films. Black-Right-Pointing-Pointer Electrochromic properties of WO{sub 3+{delta}} films depend on different oxygen contents. Black-Right-Pointing-Pointer Coloration efficiency of 213 cm{sup 2}/C is obtained in a WO{sub 3+{delta}} film with an optimized {delta}. Black-Right-Pointing-Pointer The electrochromic mechanism is presented.

  20. Mechanical properties of bismuth implanted amorphous Ge film

    Energy Technology Data Exchange (ETDEWEB)

    Juhasz, A.; Szommer, P.; Lendvai, J.; Vertesy, Z.; Peto, G. E-mail: peto@mfa.kfki.hu

    1999-01-02

    Mechanical properties of Bi ion implanted a-Ge film were studied by dynamic microhardness tests and compared to those of unimplanted a-Ge film. 400 nm thick films were evaporated in units of 30 nm thick layers and bombarded with Bi ions at 60 keV energy and 2 {mu}A/cm{sup 2} current. Cyclic load-unload indentation tests and indentation creep tests were performed to determine the hardness and ductility of the ion implanted and unimplanted specimens, respectively. The brittleness of the materials was characterised by scanning electron microscopic observation of crack formation around the Vickers indentations. The dynamic hardness was much larger, the ductility lower, the crack formation was significantly larger in the case of the unimplanted than in the ion bombarded specimens. The observed differences in the mechanical properties indicate structural differences between the two types of a-Ge are in agreement with the earlier reported formation of a new amorphous phase of Ge induced by ion implantation (G. Peto, J. Kanski, U. Sodervall, Phys. Lett. 124 (1987) 510)

  1. Mechanical properties of bismuth implanted amorphous Ge film

    Science.gov (United States)

    Juhász, A.; Szommer, P.; Lendvai, J.; Vértesy, Z.; Pető, G.

    1999-01-01

    Mechanical properties of Bi ion implanted a-Ge film were studied by dynamic microhardness tests and compared to those of unimplanted a-Ge film. 400 nm thick films were evaporated in units of 30 nm thick layers and bombarded with Bi ions at 60 keV energy and 2 μA/cm 2 current. Cyclic load-unload indentation tests and indentation creep tests were performed to determine the hardness and ductility of the ion implanted and unimplanted specimens, respectively. The brittleness of the materials was characterised by scanning electron microscopic observation of crack formation around the Vickers indentations. The dynamic hardness was much larger, the ductility lower, the crack formation was significantly larger in the case of the unimplanted than in the ion bombarded specimens. The observed differences in the mechanical properties indicate structural differences between the two types of a-Ge are in agreement with the earlier reported formation of a new amorphous phase of Ge induced by ion implantation (G. Pető, J. Kanski, U. Sodervall, Phys. Lett. 124 (1987) 510 [6]).

  2. Electron transport in W-containing amorphous carbon-silicon diamond-like nanocomposites

    International Nuclear Information System (INIS)

    The electron transport in amorphous hydrogenated carbon-silicon diamond-like nanocomposite films containing tungsten over the concentration range 12-40 at.% was studied in the temperature range 80-400 K. The films were deposited onto polycrystalline substrates, placed on the RF-biased substrate holder, by the combination of two methods: PECVD of siloxane vapours in the stimulated dc discharge and dc magnetron sputtering of tungsten target. The experimental dependences of the conductivity on the temperature are well fitted by the power-law dependences over the entire temperature range. The results obtained are discussed in terms of the model of inelastic tunnelling of the electrons in amorphous dielectrics. The average number of localized states (n) in the conducting channels between metal clusters calculated in the framework of this model is characterized by the non-monotonic dependence on the tungsten concentration in the films. The qualitative explanation of the results on the basis of host carbon-silicon matrix structural modifications is proposed. The evolution of the carbon-silicon matrix microstructure by the increase in the tungsten concentration is confirmed by the Raman spectroscopy data

  3. Bivalves build their shells from amorphous calcium carbonate

    Science.gov (United States)

    Jacob, D. E.; Wirth, R.; Soldati, A. L.; Wehrmeister, U.

    2012-04-01

    One of the most common shell structures in the bivalve class is the prism and nacre structure. It is widely distributed amongst both freshwater and marine species and gives cultured pearls their sought-after lustre. In freshwater bivalves, both shell structures (prism and nacre) consist of aragonite. Formation of the shell form an amorphous precursor phase is a wide-spread strategy in biomineralization and presents a number of advantages for the organisms in the handling of the CaCO3 material. While there is already evidence that larval shells of some mollusk species use amorphous calcium carbonate (ACC) as a transient precursor phase for aragonite, the use of this strategy by adult animals was only speculated upon. We present results from in-situ geochemistry, Raman spectroscopy and focused-ion beam assisted TEM on three species from two different bivalve families that show that remnants of ACC can be found in shells from adult species. We show that the amorphous phase is not randomly distributed, but is systematically found in a narrow zone at the interface between periostracum and prism layer. This zone is the area where spherulitic CaCO3- structures protrude from the inner periostracum to form the initial prisms. These observations are in accordance with our earlier results on equivalent structures in freshwater cultured pearls (Jacob et al., 2008) and show that the original building material for the prisms is amorphous calcium carbonate, secreted in vesicles at the inner periostracum layer. Quantitative temperature calibrations for paleoclimate applications using bivalve shells are based on the Mg-Ca exchange between inorganic aragonite (or calcite) and water. These calibrations, thus, do not take into account the biomineral crystallization path via an amorphous calcium carbonate precursor and are therefore likely to introduce a bias (a so-called vital effect) which currently is not accounted for. Jacob et al. (2008) Geochim. Cosmochim. Acta 72, 5401-5415

  4. ENHANCING ADHESION OF TETRAHEDRAL AMORPHOUS CARBON FILMS

    Institute of Scientific and Technical Information of China (English)

    赵玉清; 林毅; 王晓艳; 王炎武; 魏新宇

    2005-01-01

    TheperformanceoftheTACfilmsdeposited bytheFCVAisbetterthanthatofthediamond like carbonfilms[1,2],becausetheformerisofhigher hardnessandtransparency,smallerfriction coefficientandabsorbingtheultravioletraymore easily,etc.[3].Thesecharacteristicsaresimilarto thoseofthenaturaldiamond.Therefore,theTAC filmdepositedonawindowmaterialcanraisethe operatinglifegreatly.TheTACfilmisanideal protectivematerialforvariouskindsofwatch glassesandcameralenses. Metalandpotteryareoftenusedasthe substratesfordepositingtheTACfil...

  5. Amorphous IZO-based transparent thin film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Paine, David C. [Division of Engineering, Brown University, Providence, RI 02912 (United States)], E-mail: David_Paine@Brown.edu; Yaglioglu, Burag; Beiley, Zach; Lee, Sunghwan [Division of Engineering, Brown University, Providence, RI 02912 (United States)

    2008-07-01

    Active electronics implemented on cheap flexible polymer substrates offer the promise of novel display technologies, wearable electronics, large area memory, and a multitude of other, as-yet-unthought-of applications that require low cost and high volume manufacturing. Thin film transistors (TFT's) fabricated on temperature-sensitive plastic substrates at low temperatures are the key to this technology. TFT's that use metal (In, Zn, Sn, Ga) oxide channels offer both high mobility (relative to amorphous Si) and the advantage of optical transparency in the visible regime. We report on the fabrication and performance of amorphous oxide transparent thin film transistors that use dc-magnetron sputter techniques to deposit IZO (In{sub 2}O{sub 3} - 10 wt.% ZnO) at low oxygen potential (0 vol.% O{sub 2}) for the source, drain, and gate-contact metallization and, at higher oxygen partial pressures (10 vol.% O{sub 2}), for the semi-conducting channel. The devices in this study were processed at room temperature except for a single 280 {sup o}C PECVD deposition step to deposit a 230 nm-thick SiO{sub x} gate dielectric. The devices are optically transparent and operate in depletion mode with a threshold voltage of - 5 V, mobility of 15 cm{sup 2}/V s, an on-off ratio of > 10{sup 6} and, a sub-threshold slope of 1.2 V/decade. In addition, we report persistent photo-conductivity in the channel region of these devices when exposed to UV illumination.

  6. Effect of SR irradiation on crystallization of amorphous tin oxide film

    CERN Document Server

    Kimura, Y; Hanamoto, K; Sasaki, M; Kimura, S; Nakada, Tatsuya; Nakayama, Y; Kaito, C

    2001-01-01

    In order to see the effect of SR irradiation on crystal growth, crystallization of tin oxide films has been performed in vacuum under SR irradiation. A thin amorphous tin oxide film 50 nm thick was prepared on the carbon substrate by vacuum evaporation of SnO sub 2 power. A SnO crystal appeared between 450-500 deg. C upon vacuum heating, with a preferred orientation of (0 0 1). By SR irradiation using a cylindrical mirror for 20 s, the SnO crystal appeared with the preferred orientation of (1 1 1). The crystal with the crystallographic shear structure was grown by SR irradiation. This growth under a SR beam is discussed in terms of SR beam excitation of lone-pair electrons seen in the SnO crystal structure.

  7. Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

    OpenAIRE

    Voz Sánchez, Cristóbal; Martin, I.; Orpella, A.; Puigdollers i González, Joaquim; Vetter, M.; Alcubilla González, Ramón; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi

    2003-01-01

    In this work, we study the electronic surface passivation of crystalline silicon with intrinsic thin silicon films deposited by Catalytic CVD. The contactless method used to determine the effective surface recombination velocity was the quasi-steady-state photoconductance technique. Hydrogenated amorphous and nanocrystalline silicon films were evaluated as passivating layers on n- and p-type float zone silicon wafers. The best results were obtained with amorphous silicon films, which allowed ...

  8. Nanovoid formation by change in amorphous structure through the annealing of amorphous Al2O3 thin films

    International Nuclear Information System (INIS)

    The formation mechanism of a high density of nanovoids by annealing amorphous Al2O3 thin films prepared by an electron beam deposition method was investigated. Transmission electron microscopy observations revealed that nanovoids ∼1-2 nm in size were formed by annealing amorphous Al2O3 thin films at 973 K for 1-12 h, where the amorphous state was retained. The elastic stiffness, measured by a picosecond laser ultrasound method, and the density, measured by X-ray reflectivity, increased drastically after the annealing process, despite nanovoid formation. These increases indicate a change in the amorphous structure during the annealing process. Molecular dynamics simulations indicated that an increase in stable AlO6 basic units and the change in the ring distribution lead to a drastic increase in both the elastic stiffness and the density. It is probable that a pre-annealed Al2O3 amorphous film consists of unstable low-density regions containing a low fraction of stable AlO6 units and stable high-density regions containing a high fraction of stable AlO6 units. Thus, local density growth in the unstable low-density regions during annealing leads to nanovoid formation (i.e., local volume shrinkage).

  9. Simulation of swift boron clusters traversing amorphous carbon foils

    OpenAIRE

    Heredia Ávalos, Santiago; Abril Sánchez, Isabel; Denton Zanello, Cristian D.; García Molina, Rafael

    2007-01-01

    We use a simulation code to study the interaction of swift boron clusters (Bn+, n=2–6, 14) with amorphous carbon foils. We analyze different aspects of this interaction, such as the evolution of the cluster structure inside the target, the energy and angle distributions at the detector or the stopping power ratio. Our simulation code follows in detail the motion of the cluster fragments through the target and in the vacuum until reaching a detector, taking into account the following interacti...

  10. Role of amorphous silicon domains of Er3+ emission in the Er—doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    ChenChang-Yong; ChenWei-De; LeGuo-Hua; SongShu-Fang; DingKun; XuZhen-Jia

    2003-01-01

    An investigation on the correlation between amorphous Si(a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carrlers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:H films.

  11. Computational Evaluation of Amorphous Carbon Coating for Durable Silicon Anodes for Lithium-Ion Batteries

    Directory of Open Access Journals (Sweden)

    Jeongwoon Hwang

    2015-10-01

    Full Text Available We investigate the structural, mechanical, and electronic properties of graphite-like amorphous carbon coating on bulky silicon to examine whether it can improve the durability of the silicon anodes of lithium-ion batteries using molecular dynamics simulations and ab-initio electronic structure calculations. Structural models of carbon coating are constructed using molecular dynamics simulations of atomic carbon deposition with low incident energies (1–16 eV. As the incident energy decreases, the ratio of sp2 carbons increases, that of sp3 decreases, and the carbon films become more porous. The films prepared with very low incident energy contain lithium-ion conducting channels. Also, those films are electrically conductive to supplement the poor conductivity of silicon and can restore their structure after large deformation to accommodate the volume change during the operations. As a result of this study, we suggest that graphite-like porous carbon coating on silicon will extend the lifetime of the silicon anodes of lithium-ion batteries.

  12. Hydrogenated amorphous silicon thin film anode for proton conducting batteries

    Science.gov (United States)

    Meng, Tiejun; Young, Kwo; Beglau, David; Yan, Shuli; Zeng, Peng; Cheng, Mark Ming-Cheng

    2016-01-01

    Hydrogenated amorphous Si (a-Si:H) thin films deposited by chemical vapor deposition were used as anode in a non-conventional nickel metal hydride battery using a proton-conducting ionic liquid based non-aqueous electrolyte instead of alkaline solution for the first time, which showed a high specific discharge capacity of 1418 mAh g-1 for the 38th cycle and retained 707 mAh g-1 after 500 cycles. A maximum discharge capacity of 3635 mAh g-1 was obtained at a lower discharge rate, 510 mA g-1. This electrochemical discharge capacity is equivalent to about 3.8 hydrogen atoms stored in each silicon atom. Cyclic voltammogram showed an improved stability 300 mV below the hydrogen evolution potential. Both Raman spectroscopy and Fourier transform infrared spectroscopy studies showed no difference to the pre-existing covalent Si-H bond after electrochemical cycling and charging, indicating a non-covalent nature of the Si-H bonding contributing to the reversible hydrogen storage of the current material. Another a-Si:H thin film was prepared by an rf-sputtering deposition followed by an ex-situ hydrogenation, which showed a discharge capacity of 2377 mAh g-1.

  13. HRTEM study of Popigai impact diamond: heterogeneous diamond nanostructures in native amorphous carbon matrix

    Science.gov (United States)

    Kis, Viktoria K.; Shumilova, Tatyana; Masaitis, Victor

    2016-07-01

    High-resolution transmission electron microscopy was applied for the detailed nanostructural investigation of Popigai impact diamonds with the aim of revealing the nature of the amorphous carbon of the matrix. The successful application of two complementary specimen preparation methods, focused ion beam (FIB) milling and mechanical cleavage, allowed direct imaging of nanotwinned nanodiamond crystals embedded in a native amorphous carbon matrix for the first time. Based on its stability under the electron beam, native amorphous carbon can be easily distinguished from the amorphous carbon layer produced by FIB milling during specimen preparation. Electron energy loss spectroscopy of the native amorphous carbon revealed the dominance of sp 2-bonded carbon and the presence of a small amount of oxygen. The heterogeneous size distribution and twin density of the nanodiamond crystals and the structural properties of the native amorphous carbon are presumably related to non-graphitic (organic) carbon precursor material.

  14. Property change during nanosecond pulse laser annealing of amorphous NiTi thin film

    Indian Academy of Sciences (India)

    S K Sadrnezhaad; Noushin Yasavol; Mansoureh Ganjali; Sohrab Sanjabi

    2012-06-01

    Nanosecond lasers of different intensities were pulsed into sputter-deposited amorphous thin films of near equiatomic Ni/Ti composition to produce partially crystallized highly sensitive -phase spots surrounded by amorphous regions. Scanning electron microscopy having secondary and back-scattered electrons, field emission scanning electron microscopy, optical microscopy and X-ray diffraction patterns were used to characterize the laser treated spots. Effect of nanosecond pulse lasering on microstructure, morphology, thermal diffusion and inclusion formation was investigated. Increasing beam intensity and laser pulse-number promoted amorphous to -phase transition. Lowering duration of the pulse incidence reduced local film oxidation and film/substrate interference.

  15. Combined HRTEM and PEELS analysis of nanoporous and amorphous carbon

    International Nuclear Information System (INIS)

    Both the mass density (1.37 kgm/m3) and sp2+sp3 bonding fraction (0.15) were determined for an unusual nanoporous amorphous carbon consisting of curved single graphitic sheets. A combination of high-resolution transmission electron microscopy (HRTEM) and parallel electron energy loss spectroscopy (PEELS) was used. The values of these two parameters provide important constraints for the determination of the structure of this relatively low density variety of nanoporous carbon. The results are relevant also in the search for negatively-curved Schwarzite-related carbon structures. New date are also presented for highly-oriented pyrollytic graphite (HOPG), chemically vapour deposited (CVD) diamond, C60, glassy carbon (GC) and evaporated amorphous carbon (EAC); these are compared with the results for NAC. Kramers-Kronig analysis (KKA) of the low-loss PEELS data shows that the band gaps of both NAC and EAC are collapsed relative to that of CVD diamond. 18 refs., 2 tabs., 3 figs

  16. Amorphous silicon thin films: The ultimate lightweight space solar cell

    Science.gov (United States)

    Vendura, G. J., Jr.; Kruer, M. A.; Schurig, H. H.; Bianchi, M. A.; Roth, J. A.

    1994-01-01

    Progress is reported with respect to the development of thin film amorphous (alpha-Si) terrestrial solar cells for space applications. Such devices promise to result in very lightweight, low cost, flexible arrays with superior end of life (EOL) performance. Each alpha-Si cell consists of a tandem arrangement of three very thin p-i-n junctions vapor deposited between film electrodes. The thickness of this entire stack is approximately 2.0 microns, resulting in a device of negligible weight, but one that must be mechanically supported for handling and fabrication into arrays. The stack is therefore presently deposited onto a large area (12 by 13 in), rigid, glass superstrate, 40 mil thick, and preliminary space qualification testing of modules so configured is underway. At the same time, a more advanced version is under development in which the thin film stack is transferred from the glass onto a thin (2.0 mil) polymer substrate to create large arrays that are truly flexible and significantly lighter than either the glassed alpha-Si version or present conventional crystalline technologies. In this paper the key processes for such effective transfer are described. In addition, both glassed (rigid) and unglassed (flexible) alpha-Si cells are studied when integrated with various advanced structures to form lightweight systems. EOL predictions are generated for the case of a 1000 W array in a standard, 10 year geosynchronous (GEO) orbit. Specific powers (W/kg), power densities (W/sq m) and total array costs ($/sq ft) are compared.

  17. Reduction of Photoluminescence Quenching by Deuteration of Ytterbium-Doped Amorphous Carbon-Based Photonic Materials

    OpenAIRE

    Hui-Lin Hsu; Keith R. Leong; I-Ju Teng; Michael Halamicek; Jenh-Yih Juang; Sheng-Rui Jian; Li Qian; Nazir P. Kherani

    2014-01-01

    In situ Yb-doped amorphous carbon thin films were grown on Si substrates at low temperatures (<200 °C) by a simple one-step RF-PEMOCVD system as a potential photonic material for direct integration with Si CMOS back end-of-line processing. Room temperature photoluminescence around 1 µm was observed via direct incorporation of optically active Yb3+ ions from the selected Yb(fod)3 metal-organic compound. The partially fluorinated Yb(fod)3 compound assists the suppression of photoluminescence...

  18. Exchange bias and bistable magneto-resistance states in amorphous TbFeCo thin films

    Energy Technology Data Exchange (ETDEWEB)

    Li, Xiaopu, E-mail: xl6ba@virginia.edu; Ma, Chung T.; Poon, S. Joseph, E-mail: sjp9x@virginia.edu [Department of Physics, University of Virginia, Charlottesville, Virginia 22904 (United States); Lu, Jiwei [Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States); Devaraj, Arun [Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352 (United States); Spurgeon, Steven R.; Comes, Ryan B. [Physical and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)

    2016-01-04

    Amorphous TbFeCo thin films sputter deposited at room temperature on thermally oxidized Si substrate are found to exhibit strong perpendicular magnetic anisotropy. Atom probe tomography, scanning transmission electron microscopy, and energy dispersive X-ray spectroscopy mapping have revealed two nanoscale amorphous phases with different Tb atomic percentages distributed within the amorphous film. Exchange bias accompanied by bistable magneto-resistance states has been uncovered near room temperature by magnetization and magneto-transport measurements. The exchange anisotropy originates from the exchange interaction between the ferrimagnetic and ferromagnetic components corresponding to the two amorphous phases. This study provides a platform for exchange bias and magneto-resistance switching using single-layer amorphous ferrimagnetic thin films that require no epitaxial growth.

  19. Epitaxial growth of amorphous Ge films deposited on single-crystal Ge

    OpenAIRE

    M. G. Grimaldi; Mäenpää, M. (Markus); Paine, B. M.; Nicolet, M-A.; Lau, S. S.; Tseng, W. F.

    1981-01-01

    The epitaxial growth of amorphous Ge films deposited onto 110 Ge substrate is demonstrated. Substrate cleaning prior to deposition involves only conventional chemical procedures. The growth appears to be a strong function of the interface cleanliness. Two different growth mechanisms are observed: (a) a direct transition from amorphous to single-crystalline layer and (b) the growth involving the transition of amorphous to polycrystals to single crystal.

  20. Fabrication of hydrogenated amorphous silicon carbide films by decomposition of hexamethyldisilane with microwave discharge flow of Ar

    Science.gov (United States)

    Ito, Haruhiko; Kumakura, Motoki; Suzuki, Tsuneo; Niibe, Masahito; Kanda, Kazuhiro; Saitoh, Hidetoshi

    2016-06-01

    Hydrogenated amorphous silicon carbide films have been fabricated by the decomposition of hexamethyldisilane with a microwave discharge flow of Ar. Mechanically hard films were obtained by applying radio-frequency (RF) bias voltages to the substrate. The atomic compositions of the films were analyzed by a combination of Rutherford backscattering and elastic recoil detection, X-ray photoelectron spectroscopy (XPS), and glow discharge optical emission spectroscopy. The chemical structure was analyzed by carbon-K near-edge X-ray absorption fine structure spectroscopy, high-resolution XPS, and Fourier transform infrared absorption spectroscopy. The structural changes upon the application of RF bias were investigated, and the concentration of O atoms near the film surface was found to play a key role in the mechanical hardness of the present films.

  1. Studies to Enhance Superconductivity in Thin Film Carbon

    Science.gov (United States)

    Pierce, Benjamin; Brunke, Lyle; Burke, Jack; Vier, David; Steckl, Andrew; Haugan, Timothy

    2012-02-01

    With research in the area of superconductivity growing, it is no surprise that new efforts are being made to induce superconductivity or increase transition temperatures (Tc) in carbon given its many allotropic forms. Promising results have been published for boron doping in diamond films, and phosphorus doping in highly oriented pyrolytic graphite (HOPG) films show hints of superconductivity.. Following these examples in the literature, we have begun studies to explore superconductivity in thin film carbon samples doped with different elements. Carbon thin films are prepared by pulsed laser deposition (PLD) on amorphous SiO2/Si and single-crystal substrates. Doping is achieved by depositing from (C1-xMx) single-targets with M = B4C and BN, and also by ion implantation into pure-carbon films. Previous research had indicated that Boron in HOPG did not elicit superconducting properties, but we aim to explore that also in thin film carbon and see if there needs to be a higher doping in the sample if trends were able to be seen in diamond films. Higher onset temperatures, Tc , and current densities, Jc, are hoped to be achieved with doping of the thin film carbon with different elements.

  2. Growth processes and surface properties of diamondlike carbon films

    International Nuclear Information System (INIS)

    In this study, we compare the deposition processes and surface properties of tetrahedral amorphous carbon (ta-C) films from filtered pulsed cathodic arc discharge (PCAD) and hydrogenated amorphous carbon (a-C:H) films from electron cyclotron resonance (ECR)-plasma source ion implantation. The ion energy distributions (IEDs) of filtered-PCAD at various filter inductances and Ar gas pressures were measured using an ion energy analyzer. The IEDs of the carbon species in the absence of background gas and at low gas pressures are well fitted by shifted Maxwellian distributions. Film hardness and surface properties show a clear dependence on the IEDs. ta-C films with surface roughness at an atomic level and thin (0.3-0.9 nm) graphitelike layers at the film surfaces were deposited at various filter inductances in the highly ionized plasmas with the full width at half maximum ion energy distributions of 9-16 eV. The a-C:H films deposited at higher H/C ratios of reactive gases were covered with hydrogen and sp3 bonded carbon-enriched layers due to the simultaneous interaction of hydrocarbon species and atomic hydrogen. The effects of deposited species and ion energies on film surface properties were analyzed. Some carbon species have insufficient energies to break the delocalized π(nC) bonds at the graphitelike film surface, and they can govern film formation via surface diffusion and coalescence of nuclei. Dangling bonds created by atomic hydrogen lead to uniform chemisorption of hydrocarbon species from the ECR plasmas. The deposition processes of ta-C and a-C:H films are discussed on the basis of the experimental results

  3. Anomalous interaction of longitudinal electric field with hydrogenated amorphous silicon films

    OpenAIRE

    Zhang, J.; Gecevičius, M.; Beresna, M; Kazanskii, A.G.; Kazansky, P. G.

    2013-01-01

    Cylindrically polarized beams produced by femtosecond laser written S-waveplate are used to modify amorphous silicon films. Paradoxically, no crystallization is observed in the maximum of longitudinal electric field despite the strongest light intensity

  4. Conductive porous carbon film as a lithium metal storage medium

    International Nuclear Information System (INIS)

    Highlights: • Conductive porous carbon films were prepared by distributing amorphous carbon nanoparticles. • The porous film provides enough conductive surfaces and reduces the effective current density. • By using the film, dendritic Li growth can be effectively prevented. • The use of the porous framework can be extended for use in other 3D structured materials for efficient Li metal storage. - Abstract: The Li metal anode boasts attractive electrochemical characteristics for use in rechargeable Li batteries, such as a high theoretical capacity and a low redox potential. However, poor cycle efficiency and safety problems relating to dendritic Li growth during cycling should be addressed. Here we propose a strategy to increase the coulombic efficiency of the Li metal electrode. Conductive porous carbon films (CPCFs) were prepared by distributing amorphous carbon nanoparticles within a polymer binder. This porous structure is able to provide enough conductive surfaces for Li deposition and dissolution, which reduce the effective current density. Moreover, the pores in these films enable the electrolyte to easily penetrate into the empty space, and Li can be densely deposited between the carbon particles. As a result, dendritic Li growth can be effectively prevented. Electrochemical tests demonstrate that the coulombic efficiency of the porous electrode can be greatly improved compared to that of the pure Cu electrode. By allowing for the development of robust Li metal electrodes, this approach provides key insight into the design of high-capacity anodes for Li metal batteries, such as Li-air and Li-S systems

  5. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon

    OpenAIRE

    Ben Slama, Sonia; Hajji, Messaoud; Ezzaouia, Hatem

    2012-01-01

    Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under vacuum at 750°C. Obtained results from structural, optical, and electrical characterizations show that...

  6. Growth of amorphous selenium thin films: classical versus quantum mechanical molecular dynamics simulation

    International Nuclear Information System (INIS)

    We present the first molecular dynamics simulation of the vacuum deposition of amorphous selenium films. We compare the classical, tight-binding and Hubbard-term corrected tight-binding molecular dynamics simulation methods. Densities, coordination defects, radial distribution functions, bond angles, dihedral angles, intrachain and interchain atomic correlations were investigated in the obtained amorphous films. Local atomic arrangements were compared to results of diffraction measurements

  7. Role of amorphous silicon domains on Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    陈长勇; 陈维德; 李国华; 宋淑芳; 丁琨; 许振嘉

    2003-01-01

    An investigation on the correlation between amorphous Si (a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carriers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:Hfilms.

  8. Femtosecond Laser Crystallization of Boron-doped Amorphous Hydrogenated Silicon Films

    Directory of Open Access Journals (Sweden)

    P.D. Rybalko

    2016-10-01

    Full Text Available Crystallization of amorphous hydrogenated silicon films with femtosecond laser pulses is one of the promising ways to produce nanocrystalline silicon for photovoltaics. The structure of laser treated films is the most important factor determining materials' electric and photoelectric properties. In this work we investigated the effect of femtosecond laser irradiation of boron doped amorphous hydrogenated silicon films with different fluences on crystalline volume fraction and electrical properties of this material. A sharp increase of conductivity and essential decrease of activation energy of conductivity temperature dependences accompany the crystallization process. The results obtained are explained by increase of boron doping efficiency in crystalline phase of modified silicon film.

  9. Photoelectron spectroscopy study of metallic nanocluster arrangement at the surface of reactively sputtered amorphous hydrogenated carbon

    International Nuclear Information System (INIS)

    We report on the results of the arrangement of isolated surface metallic nanoclusters embedded in amorphous hydrogenated carbon (a-C:H) thin films, studied by photoelectron spectroscopy. As a model system we used gold-containing amorphous hydrogenated carbon (a-C:H/Au), due to the lack of reactivity between carbon and gold. The a-C:H/Au samples are obtained by simultaneous magnetron sputtering of Au target by argon and plasma-enhanced chemical vapor deposition of methane. Photoelectron spectroscopy with x-ray and ultraviolet excitation has been employed for surface studies that comprise as-deposited sample spectra recordings, measurements at off-normal takeoff angle, in situ in-depth profiling by Ar+ ion etching, and thiophene adsorption at the sample surface. The results of these extended studies firmly support previously drawn conclusions [I. R. Videnovic, V. Thommen, P. Oelhafen, D. Mathys, M. Dueggelin, and R. Guggenheim, Appl. Phys. Lett 80, 2863 (2002)] that by deposition on electrically grounded substrates one obtains samples with topmost Au clusters covered with a thin layer of a-C:H. Introducing a dc substrate bias voltage results in bald Au clusters on the surface and increased sp2/sp3 coordinated carbon ratio in the a-C:H matrix

  10. Effect of crystalline/amorphous interfaces on thermal transport across confined thin films and superlattices

    Science.gov (United States)

    Giri, Ashutosh; Braun, Jeffrey L.; Hopkins, Patrick E.

    2016-06-01

    We report on the thermal boundary resistances across crystalline and amorphous confined thin films and the thermal conductivities of amorphous/crystalline superlattices for Si/Ge systems as determined via non-equilibrium molecular dynamics simulations. Thermal resistances across disordered Si or Ge thin films increase with increasing length of the interfacial thin films and in general demonstrate higher thermal boundary resistances in comparison to ordered films. However, for films ≲3 nm, the resistances are highly dependent on the spectral overlap of the density of states between the film and leads. Furthermore, the resistances at a single amorphous/crystalline interface in these structures are much lower than those at interfaces between the corresponding crystalline materials, suggesting that diffusive scattering at an interface could result in higher energy transmissions in these systems. We use these findings, together with the fact that high mass ratios between amorphous and crystalline materials can lead to higher thermal resistances across thin films, to design amorphous/crystalline superlattices with very low thermal conductivities. In this regard, we study the thermal conductivities of amorphous/crystalline superlattices and show that the thermal conductivities decrease monotonically with increasing interface densities above 0.1 nm-1. These thermal conductivities are lower than that of the homogeneous amorphous counterparts, which alludes to the fact that interfaces non-negligibly contribute to thermal resistance in these superlattices. Our results suggest that the thermal conductivity of superlattices can be reduced below the amorphous limit of its material constituent even when one of the materials remains crystalline.

  11. Induced growth of high quality ZnO thin films by crystallized amorphous ZnO

    Institute of Scientific and Technical Information of China (English)

    Wang Zhi-Jun; Song Li-Jun; Li Shou-Chun; Lu You-Ming; Tian Yun-Xia; Liu Jia-Yi; Wang Lian-Yuan

    2006-01-01

    This paper reports the induced growth of high quality ZnO thin film by crystallized amorphous ZnO. Firstly amorphous ZnO was prepared by solid-state pyrolytic reaction, then by taking crystallized amorphous ZnO as seeds (buffer layer), ZnO thin films have been grown in diethyene glycol solution of zinc acetate at 80℃. X-ray Diffraction curve indicates that the films were preferentially oriented [001] out-of-plane direction of the ZnO. Atomic force microscopy and scanning electron microscopy were used to evaluate the surface morphology of the ZnO thin film. Photoluminescence spectrum exhibits a strong ultraviolet emission while the visible emission is very weak. The results indicate that high quality ZnO thin film was obtained.

  12. Effect of tetrahedral amorphous carbon coating on the resistivity and wear of single-walled carbon nanotube network

    Science.gov (United States)

    Iyer, Ajai; Kaskela, Antti; Novikov, Serguei; Etula, Jarkko; Liu, Xuwen; Kauppinen, Esko I.; Koskinen, Jari

    2016-05-01

    Single walled carbon nanotube networks (SWCNTNs) were coated by tetrahedral amorphous carbon (ta-C) to improve the mechanical wear properties of the composite film. The ta-C deposition was performed by using pulsed filtered cathodic vacuum arc method resulting in the generation of C+ ions in the energy range of 40-60 eV which coalesce to form a ta-C film. The primary disadvantage of this process is a significant increase in the electrical resistance of the SWCNTN post coating. The increase in the SWCNTN resistance is attributed primarily to the intrinsic stress of the ta-C coating which affects the inter-bundle junction resistance between the SWCNTN bundles. E-beam evaporated carbon was deposited on the SWCNTNs prior to the ta-C deposition in order to protect the SWCNTN from the intrinsic stress of the ta-C film. The causes of changes in electrical resistance and the effect of evaporated carbon thickness on the changes in electrical resistance and mechanical wear properties have been studied.

  13. A Selective Metasurface Absorber with An Amorphous Carbon Interlayer for Solar Thermal Applications

    CERN Document Server

    Wan, Chenglong; Nunez-Sanchez, S; Chen, Lifeng; Lopez-Garcia, M; Pugh, J; Zhu, Bofeng; Selvaraj, P; Mallick, T; Senthilarasu, S; Cryan, M J

    2016-01-01

    This paper presents fabrication, measurement and modelling results for a metal-dielectric-metal metasurface absorber for solar thermal applications. The structure uses amorphous carbon as an inter-layer between thin gold films with the upper film patterned with a 2D periodic array using focused ion beam etching. The patterned has been optimised to give high absorptance from 400-1200nm and low absorptance above this wavelength range to minimise thermal radiation and hence obtain higher temperature performance. Wide angle absorptance results are shown and detailed modelling of a realistic nanostructured upper layer results in excellent agreement between measured and modelled results. The use of gold in this paper is a first step towards a high temperature metasurface where gold can be replaced by other refractory metals such as tungsten or chrome.

  14. Amorphous Indium Selenide Thin Films Prepared by RF Sputtering: Thickness-Induced Characteristics.

    Science.gov (United States)

    Han, Myoung Yoo; Park, Yong Seob; Kim, Nam-Hoon

    2016-05-01

    The influence of indium composition, controlled by changing the film thickness, on the optical and electrical properties of amorphous indium selenide thin films was studied for the application of these materials as Cd-free buffer layers in CI(G)S solar cells. Indium selenide thin films were prepared using RF magnetron sputtering method. The indium composition of the amorphous indium selenide thin films was varied from 94.56 to 49.72 at% by increasing the film thickness from 30 to 70 nm. With a decrease in film thickness, the optical transmittance increased from 87.63% to 96.03% and Eg decreased from 3.048 to 2.875 eV. Carrier concentration and resistivity showed excellent values of ≥1015 cm(-3) and ≤ 10(4) Ω x cm, respectively. The conductivity type of the amorphous indium selenide thin films could be controlled by changing the film-thickness-induced amount of In. These results indicate the possibility of tuning the properties of amorphous indium selenide thin films by changing their composition for use as an alternate buffer layer material in CI(G)S solar cells.

  15. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XU Jun; GAO Peng; DING Wan-yu; LI Xin; DENG Xin-lu; DONG Chuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  16. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    XUJun,GAOPeng; DINGWan-yu; LIXin; DENGXin-lu; DONGChuang

    2004-01-01

    Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transtorm infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.

  17. Ultraviolet Spectroscopy of Matrix-isolated Amorphous Carbon Particles

    Science.gov (United States)

    Schnaiter, M.; Mutschke, H.; Henning, Th.; Lindackers, D.; Strecker, M.; Roth, P.

    1996-06-01

    In view of the interstellar 217.5 nm and the circumstellar 230--250 nm extinction features, the UV extinction behavior of small matrix-isolated amorphous carbon grains is investigated experimentally. The particles were produced in a flame by burning acetylene with oxygen at low pressure. To prevent coagulation, the condensing primary soot grains (average diameter ~6 nm) were extracted by a molecular beam technique into a high-vacuum chamber. There they were deposited into a layer of solid argon, isolated from each other. The particle mass and size were controlled using a particle mass spectrometer. The measured UV extinction of the matrix-isolated particles is compared with measurements on samples produced in the conventional way by collecting carbon smoke on substrate as well as with scattering calculations for small spheres and ellipsoides. The laboratory data give a good representation of the circumstellar extinction feature observed in the spectrum of V348 Sgr.

  18. Surface bioactivity of plasma implanted silicon and amorphous carbon

    Institute of Scientific and Technical Information of China (English)

    Paul K CHU

    2004-01-01

    Plasma immersion ion implantation and deposition (PⅢ&D) has been shown to be an effective technique to enhance the surface bioactivity of materials. In this paper, recent progress made in our laboratory on plasma surface modification single-crystal silicon and amorphous carbon is reviewed. Silicon is the most important material in the integrated circuit industry but its surface biocompatibility has not been investigated in details. We have recently performed hydrogen PⅢ into silicon and observed the biomimetic growth of apatite on its surface in simulated body fluid. Diamond-like carbon (DLC) is widely used in the industry due to its excellent mechanical properties and chemical inertness. The use of this material in biomedical engineering has also attracted much attention. It has been observed in our laboratory that doping DLC with nitrogen by means of PⅢ can improve the surface blood compatibility. The properties as well as in vitro biological test results will be discussed in this article.

  19. Annealing effects on the structure and electrical characteristics of amorphous Er2O3 films

    Institute of Scientific and Technical Information of China (English)

    Fang Ze-Bo; Zhu Yan-Yan; Wang Jia-Le; Jiang Zui-Min

    2009-01-01

    Amorphous Er2O3 films are deposited on Si (001) substrates by using reactive evaporation.This paper reports the evolution of the structure,morphology and electrical characteristics with annealing temperatures in an oxygen ambience.X-ray diffraction and high resolution transimission electron microscopy measurement show that the films remain amorphous even after annealing at 700℃.The capacitance in the accumulation region of Er2O3 films annealed at 450℃ is higher than that of as-deposited films and films annealed at other temperatures.An Er2O3/ErOx/SiOx/Si structure model is proposed to explain the results.The annealed films also exhibit a low leakage current density (around 1.38×10-4 A/cm2 at a bias of -1V) due to the evolution of morphology and composition of the films after they are annealed.

  20. Nanoindentation and AFM studies of PECVD DLC and reactively sputtered Ti containing carbon films

    Indian Academy of Sciences (India)

    A Pauschitz; J Schalko; T Koch; C Eisenmenger-Sittner; S Kvasnica; Manish Roy

    2003-10-01

    Amorphous carbon film, also known as DLC film, is a promising material for tribological application. It is noted that properties relevant to tribological application change significantly depending on the method of preparation of these films. These properties are also altered by the composition of the films. In view of this, the objective of the present work is to compare the nanoindentation and atomic force microscopy (AFM) study of diamond like carbon (DLC) film obtained by plasma enhanced chemical vapour deposition (PECVD) with the Ti containing amorphous carbon (Ti/-C : H) film obtained by unbalanced magnetron sputter deposition (UMSD). Towards that purpose, DLC and Ti/-C : H films are deposited on silicon substrate by PECVD and UMSD processes, respectively. The microstructural features and the mechanical properties of these films are evaluated by scanning electron microscopy (SEM), transmission electron microscopy (TEM), nanoindentation and by AFM. The results show that the PECVD DLC film has a higher elastic modulus, hardness and roughness than the UMSD Ti/-C : H film. It also has a lower pull off force than Ti containing amorphous carbon film.

  1. Surface plasmon enhanced photoluminescence in amorphous silicon carbide films by adjusting Ag island film sizes

    International Nuclear Information System (INIS)

    Ag island films with different sizes are deposited on hydrogenated amorphous silicon carbide (α-SiC:H) films, and the influences of Ag island films on the optical properties of the α-SiC:H films are investigated. Atomic force microscope images show that Ag nanoislands are formed after Ag coating, and the size of the Ag islands increases with increasing Ag deposition time. The extinction spectra indicate that two resonance absorption peaks which correspond to out-of-plane and in-plane surface plasmon modes of the Ag island films are obtained, and the resonance peak shifts toward longer wavelength with increasing Ag island size. The photoluminescence (PL) enhancement or quenching depends on the size of Ag islands, and PL enhancement by 1.6 times on the main PL band is obtained when the sputtering time is 10 min. Analyses show that the influence of surface plasmons on the PL of α-SiC:H is determined by the competition between the scattering and absorption of Ag islands, and PL enhancement is obtained when scattering is the main interaction between the Ag islands and incident light. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

  2. Amorphous-nanocrystalline Al doped ZnO transparent conducting thin films

    Energy Technology Data Exchange (ETDEWEB)

    Diez-Betriu, X., E-mail: xdiezbetriu@icmm.csic.es [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco 28049 Madrid (Spain); Jimenez-Rioboo, R.; Marcos, J. Sanchez-; Cespedes, E.; Espinosa, A.; Andres, A. de [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco 28049 Madrid (Spain)

    2012-09-25

    Highlights: Black-Right-Pointing-Pointer Al- doped ZnO films by RF- sputtering as amorphous TCO. Black-Right-Pointing-Pointer Structural characterization confirms amorphous-nanocrystalline nature of samples. Black-Right-Pointing-Pointer Optical gap dependence on substrate and grain size. Black-Right-Pointing-Pointer Resistivity correlates to the optical bandgap. - Abstract: Al-doped ZnO films have been deposited at room temperature by means of RF sputtering under different conditions and subjected to annealing treatments looking for amorphous Transparent Conducting Oxide (TCO) films in the search for their integration into the emerging area of the flexible electronics. Structural studies have been performed as well as optical and electrical characterization. Spectroscopic ellipsometry has been used for the determination of the optical gap for films grown on Si and the films thickness. The amorphous fraction of the films (up to 86%) depends on the substrate and RF power but not on the annealing temperature up to 600 Degree-Sign C for glass substrates. The resistivity is found to be independent of the amorphous degree and correlates to the optical bandgap which presents three regimes depending on the annealing temperature.

  3. Room-temperature fabrication of light-emitting thin films based on amorphous oxide semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Junghwan, E-mail: JH.KIM@lucid.msl.titech.ac.jp; Miyokawa, Norihiko; Ide, Keisuke [Materials and Structures Laboratory, Tokyo Institute of Technology, Mailbox R3-4, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Toda, Yoshitake [Materials Research Center for Element Strategy, Tokyo Institute of Technology, Mailbox SE-6, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Hiramatsu, Hidenori; Hosono, Hideo; Kamiya, Toshio [Materials and Structures Laboratory, Tokyo Institute of Technology, Mailbox R3-4, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Materials Research Center for Element Strategy, Tokyo Institute of Technology, Mailbox SE-6, 4259 Nagatsuta, Midori-ku, Yokohama (Japan)

    2016-01-15

    We propose a light-emitting thin film using an amorphous oxide semiconductor (AOS) because AOS has low defect density even fabricated at room temperature. Eu-doped amorphous In-Ga-Zn-O thin films fabricated at room temperature emitted intense red emission at 614 nm. It is achieved by precise control of oxygen pressure so as to suppress oxygen-deficiency/excess-related defects and free carriers. An electronic structure model is proposed, suggesting that non-radiative process is enhanced mainly by defects near the excited states. AOS would be a promising host for a thin film phosphor applicable to flexible displays as well as to light-emitting transistors.

  4. Ultrafast Optical Kerr Effect in Amorphous As2Se3 Film Induced by Ultrashort Laser Pulses

    Institute of Scientific and Technical Information of China (English)

    刘启明; 米君; 钱士雄; 干福熹

    2002-01-01

    Nonresonant third-order nonlinear optical properties of amorphous As2Se3 films were investigated experimentally by the method of femtosecond optical heterodyne detection of the optical Kerr effect at 805 nm with 80 fs ultrafast pulses. The results have shown that the values of real and imaginary components of third-order susceptibility of amorphous As2Se3 films were 5.6×10-12 esu and -2.0×10-13 esu, respectively. Amorphous As2Se3 films demonstrated a very fast response time within 200fs. The ultrafast response and large third-order nonlinearity are attributed to the ultrafast distortion of the electron cloud of As2Se3 films.

  5. CW laser induced crystallization of thin amorphous silicon films deposited by EBE and PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Said-Bacar, Z., E-mail: zabardjade@yahoo.fr [InESS (UMR 7163 CNRS-UDS), 23 rue de Loess, 67037 Strasbourg Cedex 2 (France); Prathap, P. [InESS (UMR 7163 CNRS-UDS), 23 rue de Loess, 67037 Strasbourg Cedex 2 (France); Cayron, C. [CEA, LITEN, DEHT, Minatec, 17 rue des Martyrs, 38054 Cedex 9 (France); Mermet, F. [IREPA LASER, Pole API - Parc d' Innovation, 67400 Illkirch (France); Leroy, Y.; Antoni, F.; Slaoui, A.; Fogarassy, E. [InESS (UMR 7163 CNRS-UDS), 23 rue de Loess, 67037 Strasbourg Cedex 2 (France)

    2012-09-15

    Highlights: Black-Right-Pointing-Pointer The effect of hydrogen in CW laser crystallization of hydrogenated amorphous silicon thin films has been investigated. Black-Right-Pointing-Pointer Large hydrogen content results in decohesion of the films due to hydrogen effusion. Black-Right-Pointing-Pointer Very low hydrogen content or hydrogen free amorphous silicon film are suitable for crystallization induced by CW laser. Black-Right-Pointing-Pointer Grains of size between 20 and 100 {mu}m in width and about 200 {mu}m in long in scanning direction are obtained with these latter films. - Abstract: This work presents the Continuous Wave (CW) laser crystallization of thin amorphous silicon (a-Si) films deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) and by Electron Beam Evaporation (EBE) on low cost glass substrate. The films are characterized by Elastic Recoil Detection Analysis (ERDA) and by Fourier-Transform Infrared (FTIR) spectroscopy to evaluate the hydrogen content. Analysis shows that the PECVD films contain a high hydrogen concentration ({approx}10 at.%) while the EBE films are almost hydrogen-free. It is found that the hydrogen is in a bonding configuration with the a-Si network and in a free form, requiring a long thermal annealing for exodiffusion before the laser treatment to avoid explosive effusion. The CW laser crystallization process of the amorphous silicon films was operated in liquid phase regime. We show by Electron Backscatter Diffraction (EBSD) that polysilicon films with large grains can be obtained with EBE as well as for the PECVD amorphous silicon provided that for the latest the hydrogen content is lower than 2 at.%.

  6. Chemical vapour deposition of amorphous Ru(P) thin films from Ru trialkylphosphite hydride complexes.

    Science.gov (United States)

    McCarty, W Jeffrey; Yang, Xiaoping; DePue Anderson, Lauren J; Jones, Richard A

    2012-11-21

    The ruthenium phosphite hydride complexes H(2)Ru(P(OR)(3))(4) (R = Me (1), Et (2), (i)Pr (3)) were used as CVD precursors for the deposition of films of amorphous ruthenium-phosphorus alloys. The as-deposited films were X-ray amorphous and XPS analysis revealed that they were predominantly comprised of Ru and P in zero oxidation states. XPS analysis also showed the presence of small amounts of oxidized ruthenium and phosphorus. The composition of the films was found to depend on ligand chemistry as well as the deposition conditions. The use of H(2) as the carrier gas had the effect of increasing the relative concentrations of P and O for all films. Annealing films to 700 °C under vacuum produced films of polycrystalline hcp Ru while a flowing stream of H(2) resulted in polycrystalline hcp RuP. PMID:23018487

  7. Amorphous Silicon-Germanium Films with Embedded Nanocrystals for Thermal Detectors with Very High Sensitivity

    Directory of Open Access Journals (Sweden)

    Cesar Calleja

    2016-01-01

    Full Text Available We have optimized the deposition conditions of amorphous silicon-germanium films with embedded nanocrystals in a plasma enhanced chemical vapor deposition (PECVD reactor, working at a standard frequency of 13.56 MHz. The objective was to produce films with very large Temperature Coefficient of Resistance (TCR, which is a signature of the sensitivity in thermal detectors (microbolometers. Morphological, electrical, and optical characterization were performed in the films, and we found optimal conditions for obtaining films with very high values of thermal coefficient of resistance (TCR = 7.9% K−1. Our results show that amorphous silicon-germanium films with embedded nanocrystals can be used as thermosensitive films in high performance infrared focal plane arrays (IRFPAs used in commercial thermal cameras.

  8. A Comparison of Photo-Induced Hysteresis Between Hydrogenated Amorphous Silicon and Amorphous IGZO Thin-Film Transistors.

    Science.gov (United States)

    Ha, Tae-Jun; Cho, Won-Ju; Chung, Hong-Bay; Koo, Sang-Mo

    2015-09-01

    We investigate photo-induced instability in thin-film transistors (TFTs) consisting of amorphous indium-gallium-zinc-oxide (a-IGZO) as active semiconducting layers by comparing with hydrogenated amorphous silicon (a-Si:H). An a-IGZO TFT exhibits a large hysteresis window in the illuminated measuring condition but no hysteresis window in the dark condition. On the contrary, a large hysteresis window measured in the dark condition in a-Si:H was not observed in the illuminated condition. Even though such materials possess the structure of amorphous phase, optical responses or photo instability in TFTs looks different from each other. Photo-induced hysteresis results from initially trapped charges at the interface between semiconductor and dielectric films or in the gate dielectric which possess absorption energy to interact with deep trap-states and affect the movement of Fermi energy level. In order to support our claim, we also perform CV characteristics in photo-induced hysteresis and demonstrate thermal-activated hysteresis. We believe that this work can provide important information to understand different material systems for optical engineering which includes charge transport and band transition.

  9. A Comparison of Photo-Induced Hysteresis Between Hydrogenated Amorphous Silicon and Amorphous IGZO Thin-Film Transistors.

    Science.gov (United States)

    Ha, Tae-Jun; Cho, Won-Ju; Chung, Hong-Bay; Koo, Sang-Mo

    2015-09-01

    We investigate photo-induced instability in thin-film transistors (TFTs) consisting of amorphous indium-gallium-zinc-oxide (a-IGZO) as active semiconducting layers by comparing with hydrogenated amorphous silicon (a-Si:H). An a-IGZO TFT exhibits a large hysteresis window in the illuminated measuring condition but no hysteresis window in the dark condition. On the contrary, a large hysteresis window measured in the dark condition in a-Si:H was not observed in the illuminated condition. Even though such materials possess the structure of amorphous phase, optical responses or photo instability in TFTs looks different from each other. Photo-induced hysteresis results from initially trapped charges at the interface between semiconductor and dielectric films or in the gate dielectric which possess absorption energy to interact with deep trap-states and affect the movement of Fermi energy level. In order to support our claim, we also perform CV characteristics in photo-induced hysteresis and demonstrate thermal-activated hysteresis. We believe that this work can provide important information to understand different material systems for optical engineering which includes charge transport and band transition. PMID:26716230

  10. Comparison in structure and property of carbon films produced by various plasmas

    International Nuclear Information System (INIS)

    For carbon coating films produced by RF plasma in the plasma CVD apparatus, the film properties such as crystal structure, chemical bond, hardness, depth composition profile and hydrogen concentration were examined. The relation of the film properties with plasma parameters was also studied. The structure of carbon film became amorphous when the electron temperature was relatively lower. However, the graphite type structure was obtained for a case with higher electron temperature and higher plasma potential. When the structure changed to graphite one, the hydrogen concentration decreased from 40% to 5% and the knoop hardness increased from 80 to 500 kg/mm2. The carbon films produced by RG discharge (TEXTOR), DC glow discharge (Heliotron-E), ECR plasma CVD (RIKEN) and Electron Beam Evaporation (EBE, Hokkaido Univ. were similarly analyzed. The film structure was a mixture type of amorphous and graphite states for ECR discharges, graphite type for EBE and amorphous type for Heliotron-E. For these films, it was also observed that the hydrogen concentration decreased as the structure changed from amorphous carbon to graphite. (author). 11 refs.; 6 figs

  11. Microstructural tuning of polycrystalline silicon films from hydrogen diluted amorphous silicon films by AIC

    Energy Technology Data Exchange (ETDEWEB)

    Prathap, P.; Tuzun, O.; Roques, S.; Schmitt, S.; Slaoui, A. [InESS, CNRS-UdS, Strasbourg Cedex-2 (France); Maurice, C. [SMS Centre, UMR CNRS 5146, Ecole des Mines de Saint Etienne, 158 Cours Fauriel, 42023 Saint Etienne Cedex 2 (France)

    2011-03-15

    In the present study, the effect of hydrogen dilution in amorphous silicon on its crystallization kinetics and defect distribution using AIC has been studied. The a -Si films were deposited at different ratios of H{sub 2}/(H{sub 2}+SiH{sub 4}) using plasma enhanced chemical vapour deposition (ECR-PECVD) on glass-ceramic substrates. The thicknesses of aluminium and a -Si:H films were 0.20 {mu}m and 0. 37 {mu}m, respectively. The bi-layer structures were annealed in a tube furnace at 475 C for 8 hours in a nitrogen atmosphere. The results indicated that as the hydrogen dilution for a -Si:H films increased from 0% to 85%, the AIC grown poly-Si films were more stressed compressively, while the Raman peak broadened from 6.7 cm{sup -1} to 8.6 cm{sup -1}. It was found that the initiation of crystallization temperature as well as microstructure of poly-Si films was dramatically influenced by the hydrogen content in precursor a -Si films. The distribution of microstructural defects analysed by Electron Back Scattering Diffraction (EBSD) method indicated that frequency of low angle grain boundaries (LAGB) were more at higher hydrogen dilution ratios while coincident site lattice boundaries (CSL) of first order ({sigma}3), second order ({sigma}9) and third order ({sigma}27) were less sensitive to the hydrogen dilutions/content (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  12. Modeling the Crystallization of Amorphous Silicon Thin Films Using a High Repetition Rate Scanning Laser

    OpenAIRE

    Černý, R.; A. Kalbáč

    2000-01-01

    An optimum design of experimental setup for the preparation of polycrystalline silicon (pc-Si) films from amorphous layers applicable in the solar cell production is analyzed in the paper. In the computational simulations, the influence of basic characteristic parameters of the experimental procedure on the mechanisms of pc-Si lateral growth is studied. Among these parameters, the energy density of the applied laser and the thickness of the amorphous silicon (a-Si) layer are identified ...

  13. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    OpenAIRE

    Jarmila Mullerova

    2006-01-01

    IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVD on glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silane plasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra of hydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. In this paper, addit...

  14. Structural,Optical and Electrical Properties of Hydrogen-Doped Amorphous GaAs Thin Films

    Institute of Scientific and Technical Information of China (English)

    YAO Yan-Ping; LIU Chun-Ling; QIAO Zhong-Liang; LI Mei; GAO Xin; BO Bao-Xue

    2008-01-01

    @@ Amorphous GaAs films are deposited on substrates of quartz glass and silicon by rf magnetron sputtering technique in different gas ambient.First,the amorphous structure of the prepared samples is identified by x-ray diffraction.Second,analysis by radial distribution function and pair correlation function method is established to characterize the microstructure of the samples.Then,the content and bond type of hydrogen are analysed using Fourier transform infrared absorption spectroscopy.

  15. Grazing incidence X-ray absorption characterization of amorphous Zn-Sn-O thin film

    Science.gov (United States)

    Moffitt, S. L.; Ma, Q.; Buchholz, D. B.; Chang, R. P. H.; Bedzyk, M. J.; Mason, T. O.

    2016-05-01

    We report a surface structure study of an amorphous Zn-Sn-O (a-ZTO) transparent conducting film using the grazing incidence X-ray absorption spectroscopy technique. By setting the measuring angles far below the critical angle at which the total external reflection occurs, the details of the surface structure of a film or bulk can be successfully accessed. The results show that unlike in the film where Zn is severely under coordinated (N coordinated (N = 4) near the surface while the coordination number around Sn is slightly smaller near the surface than in the film. Despite a 30% Zn doping, the local structure in the film is rutile-like.

  16. Amorphous carbon-silicon heterojunctions by pulsed Nd:YAG laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Yap, Seong-Shan; Yow, Ho-Kwang [Faculty of Engineering, Multimedia University, Cyberjaya, Selangor 63100 (Malaysia); Tou, Teck-Yong, E-mail: tytou@mmu.edu.m [Faculty of Engineering, Multimedia University, Cyberjaya, Selangor 63100 (Malaysia)

    2009-07-31

    Amorphous carbon (a-C) films were deposited at 10{sup -4} Pa on n-Si (Si-111) and p-Si (Si-100) substrates using a pulsed Nd:YAG laser with fundamental, second- and third-harmonic outputs. These unhydrogenated and undoped a-C films were characterized by visible and UV Raman spectroscopy which indicated the presence of substantial amount of sp{sup 3} hybridized carbon network depending on the laser wavelength. The bulk resistivity in the Au/a-C/indium tin oxide structure varied between (10{sup 9}-10{sup 13}) {Omega} cm - the lowest resistivity was obtained for films deposited by the fundamental laser output at 1064 nm while the highest value was by the third-harmonic laser output at 355 nm. All the a-C/Si heterostructures exhibited a nonlinear current density-voltage characteristic. Under light illumination, by taking into consideration the fill factor of {approx} 0.2 for a-C/n-Si, the conversion efficiency at the highest photovoltage and photocurrent, at an illumination density of 0.175 mW/cm{sup 2} was estimated to be {approx} 0.28%.

  17. Synthesis and characterization of hydrogenated amorphous carbon-based tribological coatings

    Science.gov (United States)

    Zhao, Bo

    The development of low friction surfaces is needed to improve performance and energy efficiency for macroscopic and microscopic mechanical systems. Minimizing unwanted friction and wear can lead to dramatic economic and environmental benefits. Such research is an important approach to addressing the world's increasing energy concerns. Hydrogenated amorphous carbon (CHx) thin films are ideal for some tribological applications because of their low wear rates and low coefficients of friction. The primary goal of this research is to develop and characterize modified CHx coatings so that they can be used in a variety of applications in humid environments and under higher contact loads. Doping CHx films with a small amount of sulfur (CHx+S) enables them to achieve ultralow coefficients of friction in ambient humidity. Temperature-programmed desorption and quartz crystal microbalance were used to determine that sulfur reduces water adsorption onto the film surface. Sulfur-doped films showed a decrease in the activation energy for desorption of water, or weaker film-water bonding. This decrease causes a shorter residence time of water on the surface and less equilibrium water adsorption. At a given relative humidity, sulfur-doped films adsorbed less water than undoped films. Even at 90% relative humidity, sulfur-doped films adsorbed less than 1 monolayer of water. Sulfur acts to passivate dangling bonds at the film surface susceptible to oxidation and reduces the number of surface dipoles available to attract water. This enhanced hydrophobicity increases the contact angle of adsorbed water islands, which lowers the likelihood of coalescence into a water meniscus on the film surface. The decreased quantity and discontinuity of adsorbed water molecules are responsible for CHx+S being able to achieve lower friction in humid environments. Adding titanium diboride (TiB2) to the CHx coatings yielded films with improved mechanical properties. TiB2 and CH x were synthesized in

  18. Low-temperature graphitization of amorphous carbon nanospheres

    Institute of Scientific and Technical Information of China (English)

    Katia Barbera; Leone Frusteri; Giuseppe Italiano; Lorenzo Spadaro; Francesco Frusteri; Siglinda Perathoner; Gabriele Centi

    2014-01-01

    The investigation by SEM/TEM, porosity, and X-ray diffraction measurements of the graphitization process starting from amorphous carbon nanospheres, prepared by glucose carbonization, is re-ported. Aspects studied are the annealing temperature in the 750-1000 °C range, the type of inert carrier gas, and time of treatment in the 2-6 h range. It is investigated how these parameters influ-ence the structural and morphological characteristics of the carbon materials obtained as well as their nanostructure. It is shown that it is possible to maintain after graphitization the round-shaped macro morphology, a high surface area and porosity, and especially a large structural disorder in the graphitic layers stacking, with the presence of rather small ordered domains. These are charac-teristics interesting for various catalytic applications. The key in obtaining these characteristics is the thermal treatment in a flow of N2. It was demonstrated that the use of He rather than N2 does not allow obtaining the same results. The effect is attributed to the presence of traces of oxygen, enough to create the presence of oxygen functional groups on the surface temperatures higher than 750 °C, when graphitization occurs. These oxygen functional groups favor the graphitization pro-cess.

  19. Atomic layer deposition of amorphous iron phosphates on carbon nanotubes as cathode materials for lithium-ion batteries

    International Nuclear Information System (INIS)

    A non-aqueous approach was developed to synthesize iron phosphate cathode materials by the atomic layer deposition (ALD) technique. Deposition of iron phosphate thin films was achieved on nitrogen-doped carbon nanotubes (NCNTs) by combining ALD subcycles of Fe2O3 (ferrocene-ozone) and POx (trimethyl phosphate-water) at 200 – 350 °C. The thickness of iron phosphate thin films depends linearly on the ALD cycle, indicating their self-limiting growth behavior. The growth per cycle of iron phosphate thin films was determined to be ∼ 0.2, 0.4, 0.6, and 0.5 Å, at 200, 250, 300, and 350 °C, respectively. Characterization by SEM, TEM, and HRTEM techniques revealed uniform and conformal coating of amorphous iron phosphates on the surface of NCNTs. XANES analysis confirmed Fe−O−P bonding in the iron phosphates prepared by ALD. Furthermore, electrochemical measurement verified the high electrochemical activity of the amorphous iron phosphate as a cathode material in lithium-ion batteries. It is expected that the amorphous iron phosphate prepared by this facile and cost-effective ALD approach will find applications in the next generation of lithium-ion batteries and thin film batteries as either cathode materials or surface coating materials

  20. Structure and magnetic properties of amorphous and polycrystalline Fe3O4 thin films

    Institute of Scientific and Technical Information of China (English)

    TANG Xiao-li; ZHANG Huai-wu; SU Hua; ZHONG Zhi-yong; JING Yu-lan

    2006-01-01

    Half-metallic Fe3O4 films prepared by DC magnetron reactive sputtering with a tantalum(Ta) buffer layer was investigated. Primary emphasis is placed on the structural impact on its magnetic properties. The experimental results show that the amorphous Fe3O4 films exhibit a superparamagnetic response at a large-scale from 20 nm to 150 nm,and the magnetoresistance (MR) isn't detected. By contrast,the polycrystalline Fe3O4 films possess large saturation magnetization Ms of 420 A/(kg-cm) and a clear magnetoresistance with a field of 40 kA/m. The unusual properties for the amorphous Fe3O4 film are attributed to the existing large density of the similar structure as anti-phase boundaries in the film.

  1. Magnetic and microwave properties of amorphous FeCoNbBCu thin films

    Science.gov (United States)

    Bi, Mei; Wang, Xin; Lu, Haipeng; Deng, Longjiang; Sunday, Katie Jo; Taheri, Mitra L.; Harris, Vincent G.

    2016-01-01

    The soft magnetic and microwave properties of amorphous FeCoNbBCu thin films with thicknesses varying from 70 nm to 450 nm have been systematically investigated. Due to the amorphous structure, the coercivity is 1.5 Oe in thicker films. The thickness-dependent microwave characteristics of the films were measured over the range 0.5-6 GHz and analyzed using the Landau-Lifshitz-Gilbert equation. Without applying magnetic field during deposition and measurement, an in-plane uniaxial anisotropy in amorphous thin films was obtained, ranging from 21 to 45 Oe. The interface interaction between substrate and film is confirmed to be the origin of the induced anisotropy, whereas the volume anisotropy contribution is more pronounced with increasing film thickness. For films possessing an in-plane uniaxial anisotropy, the shift of resonance frequency with thickness is observed and verified by the Kittel equation. The demonstration of a controllable and tunable anisotropy suggests that the FeCoNbBCu thin films have potential application as magnetic materials for Spintronics-based microwave devices.

  2. Low temperature CVD growth of ultrathin carbon films

    Directory of Open Access Journals (Sweden)

    Chao Yang

    2016-05-01

    Full Text Available We demonstrate the low temperature, large area growth of ultrathin carbon films by chemical vapor deposition under atmospheric pressure on various substrates. In particularly, uniform and continuous carbon films with the thickness of 2-5 nm were successfully grown at a temperature as low as 500 oC on copper foils, as well as glass substrates coated with a 100 nm thick copper layer. The characterizations revealed that the low-temperature-grown carbon films consist on few short, curved graphene layers and thin amorphous carbon films. Particularly, the low-temperature grown samples exhibited over 90% transmittance at a wavelength range of 400-750 nm and comparable sheet resistance in contrast with the 1000oC-grown one. This low-temperature growth method may offer a facile way to directly prepare visible ultrathin carbon films on various substrate surfaces that are compatible with temperatures (500-600oC used in several device processing technologies.

  3. Electrochromic and electrochemical properties of amorphous porous nickel hydroxide thin films

    International Nuclear Information System (INIS)

    Nickel hydroxide films were prepared using the chemical bath deposition (CBD) technique. The amorphous nature of the films was confirmed by X-ray diffraction measurements. X-ray photoelectron spectroscopy (XPS) measurements showed that the films exhibited nickel hydroxide nature. The porosity of the films was studied using optical measurements. The electrochromic properties of the porous nickel hydroxide layers were investigated, using cyclic voltammetry, chronoamperometry, in situ transmittance, UV-vis spectroscopy, and impedance spectroscopy. The change in the optical density (ΔOD) was found to be 0.79 for the as-deposited nickel hydroxide films, whereas it is 0.53 and 0.50 for the films annealed at 150 deg. C and 200 deg. C, respectively. The in situ transmittance and chronoamperometry curves revealed that the annealed films had a very fast colouration (tc b 2/C. The impedance measurements revealed the faster colouration and good electrochromic properties for the annealed nickel hydroxide films.

  4. Visible Absorption Properties of Retinoic Acid Controlled on Hydrogenated Amorphous Silicon Thin Film

    Science.gov (United States)

    Tsujiuchi, Yutaka; Masumoto, Hiroshi; Goto, Takashi

    2008-02-01

    Langmuir-Blodgett (LB) films of retinoic acid and LB films of retinoic acid mixed with a peptide that contains an alanine-lysine-valine (AKV) amino acid sequence deposited on a hydrogenated amorphous silicon (a-Si:H) film prepared by electron cyclotron resonance (ECR) plasma sputtering were fabricated, and their light absorption spectrums were compared. A specific visible light absorption at approximately 500 nm occurred in a film that had a film thickness of more than 80 nm and a hydrogen concentration of more than 20% in the sputtering process gas. Mixing the AKV sequence peptide with retinoic acid caused a 6 nm blueshift, from 363 to 357 nm, of the absorption maximum of the composite LB film on a SiO2 substrate. Using the same peptide, a large 30 nm blueshift, from 500 to 470 nm, was induced in the composite LB film on the a-Si:H film.

  5. Immobilization of sericin molecules via amorphous carbon plasma modified-polystyrene dish for serum-free culture

    Energy Technology Data Exchange (ETDEWEB)

    Tunma, Somruthai [The Graduate School, Chiang Mai University, 239 Huay Kaew Road, Muang District, Chiang Mai 50200 (Thailand); Thailand Center of Excellence in Physics (ThEP), 239 Huay Kaew Road, Muang District, Chiang Mai 50200 (Thailand); Song, Doo-Hoon [Research Center for Orofacial Hard Tissue Regeneration, College of Dentistry, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-752 (Korea, Republic of); Kim, Si-Eun; Kim, Kyoung-Nam [Research Center for Orofacial Hard Tissue Regeneration, College of Dentistry, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-752 (Korea, Republic of); Department and Research Institute of Dental Biomaterials and Bioengineering, College of Dentistry, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-752 (Korea, Republic of); Han, Jeon-Geon [Center for Advanced Plasma Surface Technology, Sungkyunkwan University, 300 Chunchun-dong, Jangan-gu, Suwon 440-746 (Korea, Republic of); Boonyawan, Dheerawan, E-mail: dheerawan.b@cmu.ac.th [Thailand Center of Excellence in Physics (ThEP), 239 Huay Kaew Road, Muang District, Chiang Mai 50200 (Thailand); Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, 239 Huay Kaew Road, Muang District, Chiang Mai 50200 (Thailand)

    2013-10-15

    In this study, we focused on sericin hydrolysates, originating from silkworm used in serum-free human bone marrow-derived mesenchymal stem cells (hBM-MSCs) culture. We reported the effect of a covalent linkage between a bioactive protein molecule and polystyrene dish surface via a carbon intermediate layer which can slow down the release rate of protein compounds into the phosphate buffer saline (PBS) solution. Films of amorphous carbon (a-C) and functionalized-carbon were deposited on PS culture dish surfaces by using a DC magnetron sputtering system and RF PECVD system. We found that a-C based-films can increase the hydrophilicity and biocompatibility of polystyrene (PS) dishes, especially a-C films and a-C:N{sub 2} films showed good attachment of hBM-MSCs at 24 h. However, in the case of silica surface (a-C:SiO{sub x} films), the cells showed a ragged and unattached boundary resulting from the presence of surface silanol groups. For the UV–vis absorbance, all carbon modified-PS dishes showed a lower release rate of sericin molecules into PBS solution than PS control. This revealed that the functionalized carbon could be enhanced by specific binding properties with given molecules. The carbon-coated PS dishes grafting with sericin protein were used in a serum-free condition. We also found that hBM-MSCs have higher percentage of proliferated cells at day 7 for the modified dishes with carbon films and coated with sericin than the PS control coated with sericin. The physical film properties were measured by atomic force microscopy (AFM), scanning electron microscope (SEM) and contact angle measurement. The presence of -NH{sub 2} groups of sericin compounds on the PS dish was revealed by Fourier transform infrared spectroscopy (FTIR). The stability of covalent bonds of sericin molecules after washing out ungrafted sericin was confirmed by X-ray photoelectron spectroscopy (XPS).

  6. Immobilization of sericin molecules via amorphous carbon plasma modified-polystyrene dish for serum-free culture

    Science.gov (United States)

    Tunma, Somruthai; Song, Doo-Hoon; Kim, Si-Eun; Kim, Kyoung-Nam; Han, Jeon-Geon; Boonyawan, Dheerawan

    2013-10-01

    In this study, we focused on sericin hydrolysates, originating from silkworm used in serum-free human bone marrow-derived mesenchymal stem cells (hBM-MSCs) culture. We reported the effect of a covalent linkage between a bioactive protein molecule and polystyrene dish surface via a carbon intermediate layer which can slow down the release rate of protein compounds into the phosphate buffer saline (PBS) solution. Films of amorphous carbon (a-C) and functionalized-carbon were deposited on PS culture dish surfaces by using a DC magnetron sputtering system and RF PECVD system. We found that a-C based-films can increase the hydrophilicity and biocompatibility of polystyrene (PS) dishes, especially a-C films and a-C:N2 films showed good attachment of hBM-MSCs at 24 h. However, in the case of silica surface (a-C:SiOx films), the cells showed a ragged and unattached boundary resulting from the presence of surface silanol groups. For the UV-vis absorbance, all carbon modified-PS dishes showed a lower release rate of sericin molecules into PBS solution than PS control. This revealed that the functionalized carbon could be enhanced by specific binding properties with given molecules. The carbon-coated PS dishes grafting with sericin protein were used in a serum-free condition. We also found that hBM-MSCs have higher percentage of proliferated cells at day 7 for the modified dishes with carbon films and coated with sericin than the PS control coated with sericin. The physical film properties were measured by atomic force microscopy (AFM), scanning electron microscope (SEM) and contact angle measurement. The presence of sbnd NH2 groups of sericin compounds on the PS dish was revealed by Fourier transform infrared spectroscopy (FTIR). The stability of covalent bonds of sericin molecules after washing out ungrafted sericin was confirmed by X-ray photoelectron spectroscopy (XPS).

  7. Bond topography and nanostructure of hydrogenated fullerene-like carbon films: A comparative study

    Science.gov (United States)

    Wang, Yongfu; Gao, Kaixiong; Shi, Jing; Zhang, Junyan

    2016-09-01

    Fullerene-like nanostructural hydrogenated amorphous carbon (FL-C:H) films were prepared by dc- and pulse- plasma enhanced chemical vapor deposition technique (PECVD). Both the films exhibit relatively stresses (0.63 GPa) in spite of their FL features and nanostructural bonding configurations, especially the pentagonal carbon rings. The creation of pentagonal rings is not fully driven by thermodynamics, but is closely related to compressive stress determined by the ion bombardment at the discharged state of the pulse- and dc- discharged plasmas methods. The dc method leads to FL's basal planes which contain less cross-linkages, and causes amorphous strongly hydrogenated structures.

  8. The Ammount of Interstellar Carbon Locked in Solid Hydrogenated Amorphous Carbon

    OpenAIRE

    Furton, D. G.; Laiho, J. W.; Witt, A. N.

    1999-01-01

    We review the literature and present new experimental data to determine the amount of carbon likely to be locked in form of solid hydrogenated amorphous carbon (HAC) grains. We conclude on the basis of a thorough analysis of the intrinsic strength of the C-H stretching band at 3.4 micron that between 10 and 80 ppM H of carbon is in the form of HAC grains. We show that it is necessary to know the level of hydrogenation (H/C) of the interstellar HAC to determine more precisely the amount of car...

  9. Nanostructuring of GeTiO amorphous films by pulsed laser irradiation

    Directory of Open Access Journals (Sweden)

    Valentin S. Teodorescu

    2015-04-01

    Full Text Available Laser pulse processing of surfaces and thin films is a useful tool for amorphous thin films crystallization, surface nanostructuring, phase transformation and modification of physical properties of thin films. Here we show the effects of nanostructuring produced at the surface and under the surface of amorphous GeTiO films through laser pulses using fluences of 10–30 mJ/cm2. The GeTiO films were obtained by RF magnetron sputtering with 50:50 initial atomic ratio of Ge:TiO2. Laser irradiation was performed by using the fourth harmonic (266 nm of a Nd:YAG laser. The laser-induced nanostructuring results in two effects, the first one is the appearance of a wave-like topography at the film surface, with a periodicity of 200 nm and the second one is the structure modification of a layer under the film surface, at a depth that is related to the absorption length of the laser radiation. The periodicity of the wave-like relief is smaller than the laser wavelength. In the modified layer, the Ge atoms are segregated in spherical amorphous nanoparticles as a result of the fast diffusion of Ge atoms in the amorphous GeTiO matrix. The temperature estimation of the film surface during the laser pulses shows a maximum of about 500 °C, which is much lower than the melting temperature of the GeTiO matrix. GeO gas is formed at laser fluences higher than 20 mJ/cm2 and produces nanovoids in the laser-modified layer at the film surface. A glass transition at low temperatures could happen in the amorphous GeTiO film, which explains the formation of the wave-like topography. The very high Ge diffusivity during the laser pulse action, which is characteristic for liquids, cannot be reached in a viscous matrix. Our experiments show that the diffusivity of atomic and molecular species such as Ge and GeO is very much enhanced in the presence of the laser pulse field. Consequently, the fast diffusion drives the formation of amorphous Ge nanoparticles through the

  10. Mesoporous amorphous tungsten oxide electrochromic films: a Raman analysis of their good switching behavior

    International Nuclear Information System (INIS)

    Graphical abstract: - Highlights: • Mesoporous films exhibit better electrochemical kinetics compared to the dense films. • Mesoporous films exhibit better reversibility compared to the dense films. • Li+cations disrupt WO3 network in a reversible way in the mesoporous film. • Li+ irreversibly intercalate in the voids of crystallites in the dense film. - Abstract: The intercalation and de-intercalation of lithium cations in electrochromic tungsten oxide thin films are significantly influenced by their structural and surface characteristics. In this study, we prepared two types of amorphous films via the sol-gel technique: one dense and one mesoporous in order to compare their response upon lithium intercalation and de-intercalation. According to chronoamperometric measurements, Li+ intercalates/de-intercalates faster in the mesoporous film (24s/6s) than in the dense film (48s/10s). The electrochemical measurements (cyclic voltammetry and chronoamperometry) also showed worse reversibility for the dense film compared to the mesoporous film, giving rise to important Li+ trapping and remaining coloration of the film. Raman analysis showed that the mesoporous film provides more accessible and various W-O surface bonds for Li+ intercalation. On the contrary, in the first electrochemical insertion and de-insertion in the dense film, Li+ selectively reacts with a few surface W-O bonds and preferentially intercalates into pre-existing crystallites to form stable irreversible LixWO3 bronze

  11. Controllable film densification and interface flatness for high-performance amorphous indium oxide based thin film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Ou-Yang, Wei, E-mail: OUYANG.Wei@nims.go.jp, E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp; Mitoma, Nobuhiko; Kizu, Takio; Gao, Xu; Lin, Meng-Fang; Tsukagoshi, Kazuhito, E-mail: OUYANG.Wei@nims.go.jp, E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp [International Center for Materials Nanoarchitectronics (WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan); Nabatame, Toshihide [MANA Foundry and MANA Advanced Device Materials Group, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)

    2014-10-20

    To avoid the problem of air sensitive and wet-etched Zn and/or Ga contained amorphous oxide transistors, we propose an alternative amorphous semiconductor of indium silicon tungsten oxide as the channel material for thin film transistors. In this study, we employ the material to reveal the relation between the active thin film and the transistor performance with aid of x-ray reflectivity study. By adjusting the pre-annealing temperature, we find that the film densification and interface flatness between the film and gate insulator are crucial for achieving controllable high-performance transistors. The material and findings in the study are believed helpful for realizing controllable high-performance stable transistors.

  12. Deviations of the glass transition temperature in amorphous conjugated polymer thin films

    Science.gov (United States)

    Liu, Dan; Osuna Orozco, Rodrigo; Wang, Tao

    2013-08-01

    The deviations of the glass transition temperature (Tg) in thin films of an amorphous conjugated polymer poly(9,9-dioctylfluorene-co-N-(4-butylphenyl)diphenylamine) (TFB) are reported. Monotonic and nonmonotonic Tg deviations are observed in TFB thin films supported on Si-SiOx and poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate) (PEDOT:PSS), respectively. A three-layer model is developed to fit both monotonic and nonmonotonic Tg deviations in these films. A 5-nm PEDOT:PSS capping layer was not found to be effective to remove the free-surface effect in Si-SiOx supported TFB films.

  13. Gas and pressure effects on the synthesis of amorphous carbon nanotubes

    Institute of Scientific and Technical Information of China (English)

    ZHAO Tingkai; LIU Yongning; ZHU Jiewu

    2004-01-01

    The effects of gas, pressure and temperature on the production of amorphous carbon nanotubes were investigated using an arc discharging furnace at controlled temperature. Co/Ni alloy powder was used as catalyst.The discharge current was 80 A and voltage was 32 V. The optimal parameters were obtained: 600℃ temperature, hydrogen gas and 500 torr pressure. The productivity and purity of amorphous carbon nanotubes are 6.5 gram per hour and 80%, respectively. The diameter of the amorphous carbon nanotubes is about 7-20 nm.

  14. Computational investigation of the mechanical and tribological responses of amorphous carbon nanoparticles

    Science.gov (United States)

    Bucholz, Eric W.; Sinnott, Susan B.

    2013-02-01

    Nanoparticles are a class of materials that have seen increasing use as friction and wear reducers in tribological applications. Amorphous carbon (a-C) films have been the subject of significant scientific and industrial interest for use as solid-state lubricants. Here, we present classical molecular dynamics simulations to investigate the mechanical and tribological responses of a-C nanoparticles that are subjected to external forces between hydrogen-terminated diamond surfaces. Over the range of a-C nanoparticle diameters (2-5 nm) and hydrogenation (0%-50%) considered, the simulations predict a consistent mechanical response where each nanoparticle is highly elastic. The simulations predict that the transition from elastic to plastic response is directly related to an increase in the percentage of carbon-carbon crosslinking within the individual nanoparticles. Contrarily, the simulations also predict that the tribological response is noticeably impacted by changes in diameter and hydrogenation. This is because during friction, hydrogen passivates the unsaturated carbon atoms near the nanoparticle's surface, which prevents interfacial bond formation and allows the nanoparticle to roll within the interface. From these findings, it is demonstrated that a-C nanoparticles are able to provide good tribological performance only when sufficient chemical passivation of the nanoparticles is maintained.

  15. Formation and structure of V-Zr amorphous alloy thin films

    KAUST Repository

    King, Daniel J M

    2015-01-01

    Although the equilibrium phase diagram predicts that alloys in the central part of the V-Zr system should consist of V2Zr Laves phase with partial segregation of one element, it is known that under non-equilibrium conditions these materials can form amorphous structures. Here we examine the structures and stabilities of thin film V-Zr alloys deposited at room temperature by magnetron sputtering. The films were characterized by X-ray diffraction, transmission electron microscopy and computational methods. Atomic-scale modelling was used to investigate the enthalpies of formation of the various competing structures. The calculations confirmed that an amorphous solid solution would be significantly more stable than a random body-centred solid solution of the elements, in agreement with the experimental results. In addition, the modelling effort provided insight into the probable atomic configurations of the amorphous structures allowing predictions of the average distance to the first and second nearest neighbours in the system.

  16. Depth profile study on Raman spectra of high-energy-electron-irradiated hydrogenated amorphous silicon films

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    According to the different penetration depths for the incident lights of 472 nm and 532 nm in hydrogenated amorphous silicon (a-Si:H) thin films, the depth profile study on Raman spectra of a-Si:H films was carried out. The network ordering evolution in the near surface and interior region of the unirradiated and irradiated a-Si:H films was investigated. The results show that there is a structural improvement in the shortand intermediate-range order towards the surface of the unirradiated a-Si:H films. The amorphous silicon network in the near and interior region becomes more disordered on the shortand intermediate-range scales after being irradiated with high energy electrons. However, the surface of the irradiated films becomes more disordered in comparison with their interior region, indicating that the created defects caused by electron irradiation are concentrated in the near surface of the irradiated films. Annealing eliminates the irradiation effects on a-Si:H thin films and the structural order of the irradiated films is similar to that of the unirradiated ones after being annealed. There exists a structural improvement in the shortand intermediate-range order towards the surface of the irradiated a-Si:H films after being annealed.

  17. Transformation from amorphous to nano-crystalline SiC thin films prepared by HWCVD technique without hydrogen dilution

    Indian Academy of Sciences (India)

    F Shariatmadar Tehrani

    2015-09-01

    Silicon carbide (SiC) thin films were deposited on Si(111) by the hot wire chemical vapour deposition (HWCVD) technique using silane (SiH4) and methane (CH4) gases without hydrogen dilution. The effects of SiH4 to CH4 gas flow ratio (R) on the structural properties, chemical composition and photoluminescence (PL) properties of the films deposited at the different gas flow ratios were investigated and compared. X-ray diffraction (XRD) and Fourier transform infrared (FTIR) spectra revealed a structural transition from amorphous SiC to cubic nano-crystalline SiC films with the increase in the gas flow ratio. Raman scattering confirmed the multi-phased nature of the films. Auger electron spectroscopy showed that the carbon incorporation in the film structure was strongly dependent on the gas flow ratio. A similar broad visible room-temperature PL with two peaks was observed for all SiC films. The main PL emission was correlated to the band to band transition in uniform a-SiC phase and the other lower energy emission was related to the confined a-Si : H clusters in a-SiC matrix. SiC nano-crystallites exhibit no significant contribution to the radiative recombination.

  18. The formation of carbon nanostructures by in situ TEM mechanical nanoscale fatigue and fracture of carbon thin films

    Energy Technology Data Exchange (ETDEWEB)

    Wang, J J; Lockwood, A J; Peng, Y; Xu, X; Inkson, B J [Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD (United Kingdom); Bobji, M S, E-mail: beverley.inkson@sheffield.ac.u [Department of Mechanical Engineering, Indian Institute of Science, Bangalore 560012, Karnataka (India)

    2009-07-29

    A technique to quantify in real time the microstructural changes occurring during mechanical nanoscale fatigue of ultrathin surface coatings has been developed. Cyclic nanoscale loading, with amplitudes less than 100 nm, is achieved with a mechanical probe miniaturized to fit inside a transmission electron microscope (TEM). The TEM tribological probe can be used for nanofriction and nanofatigue testing, with 3D control of the loading direction and simultaneous TEM imaging of the nano-objects. It is demonstrated that fracture of 10-20 nm thick amorphous carbon films on sharp gold asperities, by a single nanoscale shear impact, results in the formation of <10 nm diameter amorphous carbon filaments. Failure of the same carbon films after cyclic nanofatigue, however, results in the formation of carbon nanostructures with a significant degree of graphitic ordering, including a carbon onion.

  19. Competition between polaron pair formation and singlet fission observed in amorphous rubrene films

    Science.gov (United States)

    Jankus, Vygintas; Snedden, Edward W.; Bright, Daniel W.; Arac, Erhan; Dai, DeChang; Monkman, Andrew P.

    2013-06-01

    In this paper, we investigate excited state dynamics in amorphous rubrene vacuum sublimed films. We report the direct observation of singlet fission in amorphous rubrene films. We have determined the fission rate to be >2.5×1012 s-1. Simultaneously, we observe strong polaron pair absorption and propose that polaron pair formation could be competing with singlet fission. Another possible conclusion from our experiments could be that two triplets from singlet fission might arise via polaron pairs. In either case, polaron pairs play an important role in singlet fission in an amorphous rubrene film. We also observe that triplets created by singlet fission fuse to regenerate a singlet, giving delayed fluorescence (DF) scaling linearly with initial laser energy (i.e., one singlet gives two triplets and two triplets give back one singlet). This is a strong evidence of S1n→2T1. We did not observe substantial temperature dependence of DF decay curve shape, indicating that triplet migration in amorphous rubrene films is not hopping limited and that triplets undergo fusion before their migration.

  20. Analysis of frequency dispersion in amorphous In–Ga–Zn–O thin-film transistors

    NARCIS (Netherlands)

    Bhoolokam, A.; Nag, M.; Chasin, A.; Steudel, S.; Genoe, J.; Gelinck, G.; Groeseneken, G.; Heremans, P.

    2015-01-01

    It is shown in this paper that the finite resistance of the accumulation channel in amorphous In–Ga–Zn–O thin-film transistors (a-IGZO TFTs) is the main cause of the frequency dispersion of the capacitance–voltage curves in these devices. A transmission line model, accounting for the distributed nat

  1. Heat capacity of amorphous and disordered Nb3Ge thin films

    International Nuclear Information System (INIS)

    Heat capacity measurements on 1000 to 1500A thick amorphous Nb3Ge and granular Al films have been carried out using an ac technique. The major goal of the experiment was to study the effect of thermal fluctuations, both above and below the superconducting transition temperature T/sub c/, in dirty, short meanfree path materials

  2. Method of forming semiconducting amorphous silicon films from the thermal decomposition of fluorohydridodisilanes

    Science.gov (United States)

    Sharp, Kenneth G.; D'Errico, John J.

    1988-01-01

    The invention relates to a method of forming amorphous, photoconductive, and semiconductive silicon films on a substrate by the vapor phase thermal decomposition of a fluorohydridodisilane or a mixture of fluorohydridodisilanes. The invention is useful for the protection of surfaces including electronic devices.

  3. Conduction mechanism in amorphous InGaZnO thin film transistors

    NARCIS (Netherlands)

    Bhoolokam, A.; Nag, M.; Steudel, S.; Genoe, J.; Gelinck, G.; Kadashchuk, A.; Groeseneken, G.; Heremans, P.

    2016-01-01

    We validate a model which is a combination of multiple trapping and release and percolation model for describing the conduction mechanism in amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFT). We show that using just multiple trapping and release or percolation model is insuffi

  4. Application of HAADF STEM image analysis to structure determination in rotationally disordered and amorphous multilayered films

    Science.gov (United States)

    Mitchson, Gavin; Ditto, Jeffrey; Woods, Keenan N.; Westover, Richard; Page, Catherine J.; Johnson, David C.

    2016-08-01

    We report results from high angle annular dark field scanning transmission electron microscopy (HAADF STEM) image analysis of complex semi-crystalline and amorphous materials, and apply the insights gained from local structure information towards global structure determination. Variations in HAADF STEM intensities for a rotationally disordered heterostructure and an amorphous oxide film are statistically analyzed to extract information regarding the inhomogeneity of the films perpendicular to the substrate. By assuming chemical homogeneity in the film axis parallel to the substrate, the signal intensity variation parallel to the substrate is used to estimate the signal noise level, allowing evaluation of the significance of intensity differences in the substrate normal direction. The positions of HAADF STEM intensity peaks in the perpendicular direction, averaged from multiple images, provide a valuable initial model for a Rietveld refinement of the global c-axis structure of the heterostructure. For an amorphous multi-coat solution-cast oxide sample, the analysis reveals statistically significant variations in the HAADF STEM intensity profile perpendicular to the substrate. These variations indicate an inhomogeneous density profile, presumably related to the spin-casting of individual layers and have implications for understanding the chemical interactions that occur between layers when preparing multilayer amorphous oxide films from solution.

  5. Photoconductivity studies on amorphous and crystalline TiO{sub 2} films doped with gold nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Valverde-Aguilar, G.; Garcia-Macedo, J.A. [Universidad Nacional Autonoma de Mexico, Departamento de Estado Solido, Instituto de Fisica, Mexico D.F. (Mexico); Renteria-Tapia, V. [Universidad de Guadalajara, Centro Universitario de los Valles, Departamento de Ciencias Naturales y Exactas, Ameca, Jalisco (Mexico); Aguilar-Franco, M. [Universidad Nacional Autonoma de Mexico, Departamento de Fisica Quimica, Instituto de Fisica, Mexico D.F. (Mexico)

    2011-06-15

    In this work, amorphous and crystalline TiO{sub 2} films were synthesized by the sol-gel process at room temperature. The TiO{sub 2} films were doped with gold nanoparticles. The films were spin-coated on glass wafers. The crystalline samples were annealed at 100 C for 30 minutes and sintered at 520 C for 2 h. All films were characterized using X-ray diffraction, transmission electronic microscopy and UV-Vis absorption spectroscopy. Two crystalline phases, anatase and rutile, were formed in the matrix TiO{sub 2} and TiO{sub 2}/Au. An absorption peak was located at 570 nm (amorphous) and 645 nm (anatase). Photoconductivity studies were performed on these films. The experimental data were fitted with straight lines at darkness and under illumination at 515 nm and 645 nm. This indicates an ohmic behavior. Crystalline TiO{sub 2}/Au films are more photoconductive than the amorphous ones. (orig.)

  6. The Infrared Spectra and Absorption Intensities of Amorphous Ices: Methane and Carbon Dioxide

    Science.gov (United States)

    Gerakines, Perry A.; Hudson, Reggie L.; Loeffler, Mark J.

    2015-11-01

    Our research group is carrying out new IR measurements of icy solids relevant to the outer solar system and the interstellar medium, with an emphasis on amorphous and crystalline ices below ~70 K. Our goal is to add to the relatively meager literature on this subject and to provide electronic versions of state-of-the-art data, since the abundances of such molecules cannot be deduced without accurate reference spectra and IR band strengths. In the past year, we have focused on two of the simplest and most abundant components of icy bodies in the solar system - methane (CH4) and carbon dioxide (CO2). Infrared spectra from ˜ 4500 to 500 cm-1 have been measured for each of these molecules in μm-thick films at temperatures from 10 to 70 K. All known amorphous and crystalline phases have been reproduced and, for some, presented for the first time. We also report measurements of the index of refraction at 670 nm and the mass densities for each ice phase. Comparisons are made to earlier work where possible. Electronic versions of our new results are available at http://science.gsfc.nasa.gov/691/cosmicice/ constants.html.

  7. Nanomechanical morphology of amorphous, transition, and crystalline domains in phase change memory thin films

    Energy Technology Data Exchange (ETDEWEB)

    Bosse, J.L. [Department of Materials Science and Engineering, University of Connecticut, 97 North Eagleville Road, Unit 3136, Storrs, CT 06269-3136 (United States); Grishin, I. [Department of Physics, Lancaster University, Lancaster LA1 4YB (United Kingdom); Huey, B.D. [Department of Materials Science and Engineering, University of Connecticut, 97 North Eagleville Road, Unit 3136, Storrs, CT 06269-3136 (United States); Kolosov, O.V., E-mail: o.kolosov@lancaster.ac.uk [Department of Physics, Lancaster University, Lancaster LA1 4YB (United Kingdom)

    2014-09-30

    Highlights: • The nanomechanical morphology of GeTe and Ge{sub 2}Sb{sub 2}Te{sub 5} phase change memory thin films are investigated with combined ultrasonic force microscopy and beam exit Ar ion polishing. • Both plan-view and shallow-angle cross-sections are investigated for each stoichiometry. • Contrast in the nanomechanical response due to stiffness variations between the amorphous and crystalline phases are demonstrated up to 14% and 20% for the normal and cross-sectioned films, respectively. - Abstract: In the search for phase change materials (PCM) that may rival traditional random access memory, a complete understanding of the amorphous to crystalline phase transition is required. For the well-known Ge{sub 2}Sb{sub 2}Te{sub 5} (GST) and GeTe (GT) chalcogenides, which display nucleation and growth dominated crystallization kinetics, respectively, this work explores the nanomechanical morphology of amorphous and crystalline phases in 50 nm thin films. Subjecting these PCM specimens to a lateral thermal gradient spanning the crystallization temperature allows for a detailed morphological investigation. Surface and depth-dependent analyses of the resulting amorphous, transition and crystalline regions are achieved with shallow angle cross-sections, uniquely implemented with beam exit Ar ion polishing. To resolve the distinct phases, ultrasonic force microscopy (UFM) with simultaneous topography is implemented revealing a relative stiffness contrast between the amorphous and crystalline phases of 14% for the free film surface and 20% for the cross-sectioned surface. Nucleation is observed to occur preferentially at the PCM-substrate and free film interface for both GST and GT, while fine subsurface structures are found to be sputtering direction dependent. Combining surface and cross-section nanomechanical mapping in this manner allows 3D analysis of microstructure and defects with nanoscale lateral and depth resolution, applicable to a wide range of

  8. Heterogeneous nucleation of the amorphous phase and dissolution of nanocrystalline grains in bilayer Al-Ge thin films

    Energy Technology Data Exchange (ETDEWEB)

    Raghavan, G.; Divakar, R.; Sundari, T.; Sundararaman, D.; Tyagi, A.K.; Krishan, K. [Indira Gandhi Center for Atomic Research, Kalpakkam (India)

    1997-12-18

    Solid State Amorphization Reaction (SSAR) was first reported in thin film couples of Au-La by Schwarz et al. Since then, many other systems have been shown to undergo SSAR. Various issues involved in SSAR have been extensively investigated and reviewed. The existence of a large negative heat of mixing, anomalous fast diffusion of one component, the requirement of heterogeneous nucleation sites such as grain boundaries are found to be some of the key features of solid state amorphization. The authors present in this paper evidence of heterogeneous nucleation and growth of the amorphous phase followed by the precipitation of germanium from the amorphous phase in Al-Ge bilayer films.

  9. Magnetism of Amorphous and Nano-Crystallized Dc-Sputter-Deposited MgO Thin Films

    Directory of Open Access Journals (Sweden)

    K. V. Rao

    2013-08-01

    Full Text Available We report a systematic study of room-temperature ferromagnetism (RTFM in pristine MgO thin films in their amorphous and nano-crystalline states. The as deposited dc-sputtered films of pristine MgO on Si substrates using a metallic Mg target in an O2 containing working gas atmosphere of (N2 + O2 are found to be X-ray amorphous. All these films obtained with oxygen partial pressure (PO2 ~10% to 80% while maintaining the same total pressure of the working gas are found to be ferromagnetic at room temperature. The room temperature saturation magnetization (MS value of 2.68 emu/cm3 obtained for the MgO film deposited in PO2 of 10% increases to 9.62 emu/cm3 for film deposited at PO2 of 40%. However, the MS values decrease steadily for further increase of oxygen partial pressure during deposition. On thermal annealing at temperatures in the range 600 to 800 °C, the films become nanocrystalline and as the crystallite size grows with longer annealing times and higher temperature, MS decreases. Our study clearly points out that it is possible to tailor the magnetic properties of thin films of MgO. The room temperature ferromagnetism in MgO films is attributed to the presence of Mg cation vacancies.

  10. Deposition of diamond like carbon films by using a single ion gun with varying beam source

    Institute of Scientific and Technical Information of China (English)

    JIANG Jin-qiu; Chen Zhu-ping

    2001-01-01

    Diamond like carbon films have been successfully deposited on the steel substrate, by using a single ion gun with varying beam source. The films may appear blue, yellow and transparent in color, which was found related to contaminants from the sample holder and could be avoided. The thickness of the films ranges from tens up to 200 nanometers, and the hardness is in the range 20 to 30 GPa. Raman analytical results reveal the films are in amorphous structure. The effects of different beam source on the films structure are further discussed.

  11. Suppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Aikawa, Shinya, E-mail: aikawa@cc.kogakuin.ac.jp, E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp [International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044 (Japan); Research Institute for Science and Technology, Kogakuin University, Hachioji, Tokyo 192-0015 (Japan); Mitoma, Nobuhiko; Kizu, Takio; Tsukagoshi, Kazuhito, E-mail: aikawa@cc.kogakuin.ac.jp, E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp [International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044 (Japan); Nabatame, Toshihide [MANA Foundry and MANA Advanced Device Materials Group, National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044 (Japan)

    2015-05-11

    We discuss the environmental instability of amorphous indium oxide (InO{sub x})-based thin-film transistors (TFTs) in terms of the excess oxygen in the semiconductor films. A comparison between amorphous InO{sub x} doped with low and high concentrations of oxygen binder (SiO{sub 2}) showed that out-diffusion of oxygen molecules causes drastic changes in the film conductivity and TFT turn-on voltages. Incorporation of sufficient SiO{sub 2} could suppress fluctuations in excess oxygen because of the high oxygen bond-dissociation energy and low Gibbs free energy. Consequently, the TFT operation became rather stable. The results would be useful for the design of reliable oxide TFTs with stable electrical properties.

  12. Al-induced Lateral Crystallization of Amorphous Si Thin Films by Microwave Annealing

    Institute of Scientific and Technical Information of China (English)

    RAO Rui; XU Zhong-yang; ZENG Xiang-bing

    2002-01-01

    Al-induced lateral crystallization of amorphous silicon thin films by microwave annealing is investigated. The crystallized Si films are examined by optical microscopy , Raman spectroscopy, transmission electron microscopy and transmission electron diffraction micrography. After microwave annealing at 480 ℃ for 50 min,the amorphous Si is completely crystallized with large grains of main ( 111 ) orientation. The rate of lateral crystallization is 0.04μm/min. This process, labeled MILC-MA, not only lowers the temperature but also reduces the time of crystallization. The crystallization mechanism during microwave annealing and the electrical properties of polycrystalline Si thin films are analyzed. This MILC-MA process has potential applications in large area electronics.

  13. Room-temperature fabrication of light-emitting thin films based on amorphous oxide semiconductor

    Directory of Open Access Journals (Sweden)

    Junghwan Kim

    2016-01-01

    Full Text Available We propose a light-emitting thin film using an amorphous oxide semiconductor (AOS because AOS has low defect density even fabricated at room temperature. Eu-doped amorphous In-Ga-Zn-O thin films fabricated at room temperature emitted intense red emission at 614 nm. It is achieved by precise control of oxygen pressure so as to suppress oxygen-deficiency/excess-related defects and free carriers. An electronic structure model is proposed, suggesting that non-radiative process is enhanced mainly by defects near the excited states. AOS would be a promising host for a thin film phosphor applicable to flexible displays as well as to light-emitting transistors.

  14. Amorphous semiconducting and conducting transparent metal oxide thin films and production thereof

    Science.gov (United States)

    Perkins, John; Van Hest, Marinus Franciscus Antonius Maria; Ginley, David; Taylor, Matthew; Neuman, George A.; Luten, Henry A.; Forgette, Jeffrey A.; Anderson, John S.

    2010-07-13

    Metal oxide thin films and production thereof are disclosed. An exemplary method of producing a metal oxide thin film may comprise introducing at least two metallic elements and oxygen into a process chamber to form a metal oxide. The method may also comprise depositing the metal oxide on a substrate in the process chamber. The method may also comprise simultaneously controlling a ratio of the at least two metallic elements and a stoichiometry of the oxygen during deposition. Exemplary amorphous metal oxide thin films produced according to the methods herein may exhibit highly transparent properties, highly conductive properties, and/or other opto-electronic properties.

  15. Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Pavlista, Martin; Hrdlicka, Martin; Prikryl, Jan [University of Pardubice, Research Centre Advanced Inorganic Materials, Faculty of Chemical Technology, Pardubice (Czech Republic); Nemec, Petr; Frumar, Miloslav [University of Pardubice, Research Centre Advanced Inorganic Materials, Faculty of Chemical Technology, Pardubice (Czech Republic); University of Pardubice, Department of General and Inorganic Chemistry, Faculty of Chemical Technology, Pardubice (Czech Republic)

    2008-11-15

    Amorphous chalcogenide thin films were prepared from As{sub 2}Se{sub 3}, As{sub 3}Se{sub 2} and InSe bulk glasses by pulsed laser deposition using a KrF excimer laser. Thickness profiles of the films were determined using variable angle spectroscopic ellipsometry. The influence of the laser beam scanning process during the deposition on the thickness distribution of the prepared thin films was evaluated and the corresponding equations suggested. The results were compared with experimental data. (orig.)

  16. 石墨表层对四面体非晶炭膜中受激电子的石墨建序化作用%The role of a graphitic surface layer in electron-stimulated ordering in tetrahedral amorphous carbon films

    Institute of Scientific and Technical Information of China (English)

    梁士金; Tatsuya Banno; Yutaka Mera; Masahiro Kitajima; Kunie Ishioka; Yoshihisa Harada; Yoshinori Kitajima; Shik Shin; Koji Maeda

    2008-01-01

    对渗气阴极真空电弧法制备的四而体非晶炭(ta-c)膜实施氧等离子体刻蚀,消除其表面石墨层后,发现:原沉积膜中ta-C石墨表层的消除会影响其受激电子的石墨建序化.应用发射电子能耗谱,表面增强拉曼光谱和表面敏化X光吸收光谱等测量方法,测定了其表层的淌除(程度).样品的氧等离子体刻蚀阻迟了受激电子的石墨化作用,可能归因于多相成核过程中石墨晶核的缺失之故.%Electron-stimulated graphitic ordering in tetrahedral amorphous carbon (ta-C) films was found to be affected by the removal of the graphitic surface layer present in as-deposited films. To remove the graphitic layer on ta-C films fabricated by the filtered cathodic vacuum are method, the sample was etched with oxygen plasma. The removal of the surface layer was examined by transmission electron energy loss spectroscopy, surface-enhanced Raman spectroscopy,and surface-sensitive X-ray absorption spectroscopic measurements. The electron-stimulated graphitization was retarded in oxygen plasma etched samples presumably owing to the lack of graphitic nuclei for heterogeneous nucleation.

  17. The Ammount of Interstellar Carbon Locked in Solid Hydrogenated Amorphous Carbon

    CERN Document Server

    Furton, D G; Witt, A N

    1999-01-01

    We review the literature and present new experimental data to determine the amount of carbon likely to be locked in form of solid hydrogenated amorphous carbon (HAC) grains. We conclude on the basis of a thorough analysis of the intrinsic strength of the C-H stretching band at 3.4 micron that between 10 and 80 ppM H of carbon is in the form of HAC grains. We show that it is necessary to know the level of hydrogenation (H/C) of the interstellar HAC to determine more precisely the amount of carbon it ties up. We present optical constants, photoluminescence spectroscopy, and IR absorption spectroscopy for a particular HAC sample that is shown to have a 3.4 micron absorption feature that is quantatively consistent with that observed in the diffuse interstellar medium.

  18. Microstructure and properties of hydrophobic films derived from Fe-W amorphous alloy

    Institute of Scientific and Technical Information of China (English)

    Song Wang; Yun-han Ling; Jun Zhang; Jian-jun Wang; Gui-ying Xu

    2014-01-01

    Amorphous metals are totally different from crystalline metals in regard to atom arrangement. Amorphous metals do not have grain boundaries and weak spots that crystalline materials contain, making them more resistant to wear and corrosion. In this study, amorphous Fe-W alloy films were first prepared by an electroplating method and were then made hydrophobic by modification with a water repellent (heptadecafluoro-1,1,2,2-tetradecyl) trimethoxysilane. Hierarchical micro-nano structures can be obtained by slightly oxidizing the as-deposited alloy, accompanied by phase transformation from amorphous to crystalline during heat treatment. The mi-cro-nano structures can trap air to form an extremely thin cushion of air between the water and the film, which is critical to producing hydrophobicity in the film. Results show that the average values of capacitance, roughness factor, and impedance for specific surface areas of a 600°C heat-treated sample are greater than those of a sample treated at 500°C. Importantly, the coating can be fabricated on various metal substrates to act as a corrosion retardant.

  19. Crystallization behavior of amorphous indium-gallium-zinc-oxide films and its effects on thin-film transistor performance

    Science.gov (United States)

    Suko, Ayaka; Jia, JunJun; Nakamura, Shin-ichi; Kawashima, Emi; Utsuno, Futoshi; Yano, Koki; Shigesato, Yuzo

    2016-03-01

    Amorphous indium-gallium-zinc oxide (a-IGZO) films were deposited by DC magnetron sputtering and post-annealed in air at 300-1000 °C for 1 h to investigate the crystallization behavior in detail. X-ray diffraction, electron beam diffraction, and high-resolution electron microscopy revealed that the IGZO films showed an amorphous structure after post-annealing at 300 °C. At 600 °C, the films started to crystallize from the surface with c-axis preferred orientation. At 700-1000 °C, the films totally crystallized into polycrystalline structures, wherein the grains showed c-axis preferred orientation close to the surface and random orientation inside the films. The current-gate voltage (Id-Vg) characteristics of the IGZO thin-film transistor (TFT) showed that the threshold voltage (Vth) and subthreshold swing decreased markedly after the post-annealing at 300 °C. The TFT using the totally crystallized films also showed the decrease in Vth, whereas the field-effect mobility decreased considerably.

  20. Roughening transition in nanoporous hydrogenated amorphous germanium: Roughness correlation to film stress

    Science.gov (United States)

    Carroll, M. S.; Verley, J. C.; Sheng, J. J.; Banks, J.

    2007-03-01

    Hydrogenated amorphous germanium (a-Ge:H) is a material of interest for optoelectronic applications such as solar cells and radiation detectors because of the material's potential to extend the wavelength sensitivity of hydrogenated amorphous silicon (a-Si:H). An increase in porosity is observed in amorphous germanium compared to a-Si :H, and this increase in porosity has been correlated with a degradation of the electrical performance. Improved understanding of the mechanisms of porous formation in a-Ge :H films is therefore desirable in order to better control it. In this paper we describe a correlation between film stress and surface roughness, which evolves with increasing thickness of a-Ge :H. A roughening transition from planar two-dimensional growth to three-dimensional growth at a critical thickness less than 800Å results in a network of needlelike nanotrench cavities which stretch from the transition thickness to the surface in films up to 4000Å thick. Surface roughness measurements by atomic force microscope and transmission electron microscopy indicate that the transition is abrupt and that the roughness increases linearly after the transition thickness. The roughening transition thickness is, furthermore, found to correlate with the maxima of the integrated compressive stress. The compressive stress is reduced after this transition thickness due to the incorporation of nanovoids into the film that introduce tensile stress as the islands coalesce together. The roughening transition behavior is similar to that found in a general class of Volmer-Weber mode thin film deposition (e.g., Cu, Ag, and nonhydrogenated amorphous silicon), which offers additional insight into the underlying mechanisms of the stress and roughening in these a-Ge :H films. The suppression of the roughening transition by changing the kinetics of the deposition rates (e.g., slowing the deposition rate with a weak sputtering bias) is also observed and discussed.

  1. Magnetoimpedance in amorphous/metal/amorphous sandwiched films at GHz frequencies

    Energy Technology Data Exchange (ETDEWEB)

    Correa, M.A. [Departamento de Fisica, CCNE, UFSM, 97105-900, Santa Maria, RS (Brazil)]. E-mail: mmacorrea@gmail.com; Viegas, A.D.C. [Departamento de Fisica, CCNE, UFSM, 97105-900, Santa Maria, RS (Brazil); Silva, R.B. da [Departamento de Fisica, CCNE, UFSM, 97105-900, Santa Maria, RS (Brazil); Andrade, A.M.H. de [Departamento de Fisica, CCNE, UFSM, 97105-900, Santa Maria, RS (Brazil); Sommer, R.L. [Centro Brasileiro de Pesquisas Fisicas, 22290-180, Rio de Janeiro, RJ (Brazil)

    2006-10-01

    In this work, we report a comparative study of the magnetoimpedance in sandwiched films with the structure FS/Cu/FS (SWS) and FM/Cu/FM (SWM) where FS=single-layer FeCuNbSiB and FM=multilayer FeCuNbSiB/Cu. Magnetoimpedance ratios of 250% were obtained for the real part of the impedance in the SWM sample, while variations of 100% were reached for the SWS sample.

  2. Development of amorphous carbon protective coatings on poly(vinyl)chloride

    International Nuclear Information System (INIS)

    The great versatility of polymers has promoted their application in a series of ordinary situations. The development of specific devices from polymers, however, requires modifications to fit specific stipulations. In this work the surface properties of thin films grown onto polyvinylchloride (PVC) were investigated. Hydrogenated amorphous carbon films were deposited onto commercial PVC plates from acetylene and argon plasmas excited by radiofrequency (13.56 MHz, 70 W) power. The proportion of acetylene in the gas feed was varied against that of argon, keeping the total pressure constant at 2.5 Pa. Deposition time was 1800 s. Film elemental composition was analyzed by X-ray photoelectron spectroscopy, XPS. Water contact angle measurements were performed using the sessile drop technique. The root mean squared roughness was derived from 50 x 50 μm2 surface topographic images, acquired by scanning probe microscopy. Nanoindentation and pin-on-disk techniques were employed on the determination of film hardness and sliding wear, respectively. Oxidation resistance was obtained through the etching rate of the samples in oxygen radiofrequency (1.3 Pa, 50 W) plasmas. From XPS analysis it was detected oxygen and nitrogen contamination in all the samples. It was also found that sp3/sp2 ratio depends on the proportion of argon in the plasma. At lower argon concentrations, hardness, wear and oxidation resistances were all improved with respect to the uncoated PVC. In such conditions, the surface wettability is low indicating a moderate receptivity to water. This combination of properties, ascribed to a balance between the ion bombardment and deposition processes, is suitable for materials exposed to rigorous weathering conditions.

  3. Electrical and switching properties of InSe amorphous thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kenawy, M.A.; Zayed, H.A.; El-Zahid, H.A. (Univ. Coll. for Girls, Ain Shams Univ., Cairo (Egypt)); El-Shazly, A.F.; Afifi, M.A. (Faculty of Education, Ain Shams Univ., Cairo (Egypt))

    1991-05-15

    In this work electrical and switching properties of InSe thin films have been studied. The semiconductor compound InSe was obtained by direct synthesis from stoichiometric amounts of spectroscopically pure indium and selenium. By slow cooling of the synthesized InSe a polycrystalline material is obtained. The amorphous films were obtained by thermal evaporation under vacuum of the polycrystalline material on glass or pyrographite substrates. From electrical measurements, it was found that for all films the dark electrical resistivity decreases with an increase in film thickness and temperature. The InSe compound exhibits non-linear I-V characteristics and switching phenomena. The threshold voltage decreases with increasing annealing temperature and increases with increasing film thickness. (orig.).

  4. Amorphous/microcrystalline transition of thick silicon film deposited by PECVD

    Science.gov (United States)

    Elarbi, N.; Jemaï, R.; Outzourhit, A.; Khirouni, K.

    2016-06-01

    Thick silicon films were deposited by plasma-enhanced chemical vapor deposition at different plasma power densities. Annealing treatment was performed on these deposited films. As-deposited and annealed films were characterized by X-ray diffraction, Raman scattering spectroscopy and reflectance spectroscopy. Before annealing, only the film deposited at the plasma power density of 500 mW/cm2 exhibits a diffraction peak corresponding to the (111) plane orientation. Raman spectrum of this film confirms the presence of crystalline phase. After annealing, a transition from amorphous phase to crystalline one occurs for all samples. This transition is accompanied by an increase of the crystalline fraction volume deduced from Raman spectra analysis and by a reduction of optical gap energy.

  5. The nanoindentation applied to predict the interface delamination for the C/amorphous Si composite film

    Science.gov (United States)

    Han, Chang-Fu; Huang, Chao-Yu; Wu, Bo-Hsiung; Lin, Jen-Fin

    2009-10-01

    In the present study, the indentation depth corresponding to the pop-in arising in the loading process is found to be quite close to the C/amorphous Si composite film thickness, regardless of the C-film thickness. This load-depth behavior gives a clue that the occurrence of pop-in is perhaps related to the buckling of the composite film, which had already delaminated from the silicon substrate. This indentation depth of buckling predicted by the present model is quite close to the pop-in depth obtained from experimental results, regardless of the change in the C-film thickness. This characteristic reveals that the present model is developed successfully to predict the pop-in depth of a specimen, and the pop-in is indeed created due to the buckling of the composite film under a compression stress.

  6. Amorphous indium gallium zinc oxide thin film grown by pulse laser deposition technique

    Science.gov (United States)

    Mistry, Bhaumik V.; Joshi, U. S.

    2016-05-01

    Highly electrically conducting and transparent in visible light IGZO thin film were grown on glass substrate at substrate temperature of 400 C by a pulse laser deposition techniques. Structural, surface, electrical, and optical properties of IGZO thin films were investigated at room temperature. Smooth surface morphology and amorphous nature of the film has been confirmed from the AFM and GIXRD analysis. A resistivity down to 7.7×10-3 V cm was reproducibly obtained while maintaining optical transmission exceeding 70% at wavelengths from 340 to 780 nm. The carrier densities of the film was obtain to the value 1.9×1018 cm3, while the Hall mobility of the IGZO thin film was 16 cm2 V-1S-1.

  7. Fabrication of amorphous silicon nanoribbons by atomic force microscope tip induced local oxidation for thin film device applications

    OpenAIRE

    Pichon, Laurent; Rogel, Regis; Demami, Fouad

    2010-01-01

    WOS International audience We demonstrate the feasibility of induced local oxidation of amorphous silicon by atomic force microscopy. The resulting local oxide is used as mask for the elaboration of thin film silicon resistor. A thin amorphous silicon layer deposited on a glass substrate is locally oxidized following narrow continuous lines. The corresponding oxide line is then used as mask during plasma etching of the amorphous layer leading to the formation of nanoribbon. Such amorpho...

  8. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    Directory of Open Access Journals (Sweden)

    Jarmila Mullerova

    2006-01-01

    Full Text Available IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVDon glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silaneplasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra ofhydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. Inthis paper, additional understanding was retrieved from infrared response. Applying standard optical laws, effective mediatheory and Clausius-Mossoti approach concerning the Si-Si and Si-H bonds under IR irradiation as individual oscillators,refractive indices in the long wavelength limit, crystalline, amorphous and voids volume fractions and the mass density of thefilms were determined. The mass density was found to decrease with increasing crystalline volume fraction, which can beattributed to the void-dominated mechanism of network formation.

  9. Boron doping compensation of hydrogenated amorphous and polymorphous germanium thin films for infrared detection applications

    Energy Technology Data Exchange (ETDEWEB)

    Moreno, M., E-mail: mmoreno@inaoep.mx [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico); Delgadillo, N. [Universidad Autónoma de Tlaxcala, Av. Universidad No. 1, Z. P. 90006 Tlaxcala (Mexico); Torres, A. [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico); Ambrosio, R. [Technology and Engineering Institute, Ciudad Juarez University UACJ, Av. Del Charro 450N, Z. P. 32310 Chihuahua (Mexico); Rosales, P.; Kosarev, A.; Reyes-Betanzo, C.; Hidalga-Wade, J. de la; Zuniga, C.; Calleja, W. [National Institute of Astrophysics, Optics and Electronics, INAOE, P.O. Box 51 and 216, Puebla, Z. P. 72840 Puebla (Mexico)

    2013-12-02

    In this work we have studied boron doping of hydrogenated amorphous germanium a-Ge:H and polymorphous germanium (pm-Ge:H) in low regimes, in order to compensate the material from n-type (due to oxygen contamination that commonly occurs during plasma deposition) to intrinsic, and in this manner improve the properties that are important for infrared (IR) detection, as activation energy (E{sub a}) and temperature coefficient of resistance (TCR). Electrical, structural and optical characterization was performed on the films produced. Measurements of the temperature dependence of conductivity, room temperature conductivity (σ{sub RT}), E{sub a} and current–voltage characteristics under IR radiation were performed in the compensated a-Ge:H and pm-Ge:H films. Our results demonstrate that, effectively, the values of E{sub a}, TCR and IR detection are improved on the a-Ge:H/pm-Ge:H films, using boron doping in low regimes, which results of interest for infrared detectors. - Highlights: • We reported boron doping compensation of amorphous and polymorphous germanium. • The films were deposited by plasma enhanced chemical vapor deposition. • The aim is to use the films as thermo-sensing elements in un-cooled microbolometers. • Those films have advantages over boron doped a-Si:H used in commercial detectors.

  10. Transformation mechanism of amorphous calcium carbonate into calcite in the sea urchin larval spicule.

    Science.gov (United States)

    Politi, Yael; Metzler, Rebecca A; Abrecht, Mike; Gilbert, Benjamin; Wilt, Fred H; Sagi, Irit; Addadi, Lia; Weiner, Steve; Gilbert, P U P A; Gilbert, Pupa

    2008-11-11

    Sea urchin larval spicules transform amorphous calcium carbonate (ACC) into calcite single crystals. The mechanism of transformation is enigmatic: the transforming spicule displays both amorphous and crystalline properties, with no defined crystallization front. Here, we use X-ray photoelectron emission spectromicroscopy with probing size of 40-200 nm. We resolve 3 distinct mineral phases: An initial short-lived, presumably hydrated ACC phase, followed by an intermediate transient form of ACC, and finally the biogenic crystalline calcite phase. The amorphous and crystalline phases are juxtaposed, often appearing in adjacent sites at a scale of tens of nanometers. We propose that the amorphous-crystal transformation propagates in a tortuous path through preexisting 40- to 100-nm amorphous units, via a secondary nucleation mechanism.

  11. Atomic oxygen resistant behaviors of Mo/diamond-like carbon nanocomposite lubricating films

    International Nuclear Information System (INIS)

    Mo doped diamond-like carbon (Mo/DLC) films were deposited on Si substrates via unbalanced magnetron sputtering of molybdenum combined with plasma chemical vapor deposition of CH4/Ar. The microstructure of the films, characterized by transmission electron microscopy and selected area electron diffraction, was considered as a nanocomposite with nano-sized MoC particles uniformly embedded in the amorphous carbon matrix. The structure, morphology, surface composition and tribological properties of the Mo/DLC films before and after the atomic oxygen (AO) irradiation were investigated and a comparison made with the DLC films. The Mo/DLC films exhibited more excellent degradation resistant behaviors in AO environment than the DLC films, and the MoC nanoparticles were proved to play a critical role of preventing the incursion of AO and maintaining the intrinsic structure and excellent tribological properties of DLC films.

  12. Ultrathin diamond-like carbon films deposited by filtered carbon vacuum arcs

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre; Fong, Walton; Kulkarni, Ashok; Ryan, Francis W.; Bhatia, C. Singh

    2001-07-13

    Ultrathin (< 5 nm) hard carbon films are of great interest to the magnetic storage industry as the areal density approaches 100 Gbit/in{sup 2}. These films are used as overcoats to protect the magnetic layers on disk media and the active elements of the read-write slider. Tetrahedral amorphous carbon films can be produced by filtered cathodic arc deposition, but the films will only be accepted by the storage industry only if the ''macroparticle'' issue has been solved. Better plasma filters have been developed over recent years. Emphasis is put on the promising twist filter system - a compact, open structure that operates with pulsed arcs and high magnetic field. Based on corrosion tests it is shown that the macroparticle reduction by the twist filter is satisfactory for this demanding application, while plasma throughput is very high. Ultrathin hard carbon films have been synthesized using S-filter and twist filter systems. Film properties such as hardness, elastic modulus, wear, and corrosion resistance have been tested.

  13. Structural evolutions in polymer-derived carbon-rich amorphous silicon carbide.

    Science.gov (United States)

    Wang, Kewei; Ma, Baisheng; Li, Xuqin; Wang, Yiguang; An, Linan

    2015-01-29

    The detailed structural evolutions in polycarbosilane-derived carbon-rich amorphous SiC were investigated semiquantitatively by combining experimental and analytical methods. It is revealed that the material is comprised of a Si-containing matrix phase and a free-carbon phase. The matrix phase is amorphous, comprised of SiC4 tetrahedra, SiCxOx-4 tetrahedra, and Si-C-C-Si/Si-C-H defects. With increasing pyrolysis temperature, the amorphous matrix becomes more ordered, accompanied by a transition from SiC2O2 to SiCO3. The transition was completed at 1250 °C, where the matrix phase started to crystallize by forming a small amount of β-SiC. The free-carbon phase was comprised of carbon nanoclusters and C-dangling bonds. Increasing pyrolysis temperature led to the transition of the free carbon from amorphous carbon to nanocrystalline graphite. The size of the carbon clusters decreased first and then increased, while the C-dangling bond content decreased continuously. The growth of carbon clusters was attributed to Ostwald ripening and described using a two-dimensional grain growth model. The calculated activation energy suggested that the decrease in C-dangling bonds is directly related to the lateral growth of the carbon clusters. PMID:25490064

  14. Degradation of electrochromic film of amorphous tungsten oxide after coloration

    Science.gov (United States)

    Luo, Zhongkuan

    1992-11-01

    The degradation of the electrochromic film of a-WO3 was investigated from the equilibrium state of different driving voltage and the time dependent emf was also obtained in an open or short circuit of zero volts. Based on the mechanism of activation and the principal of chemical reaction kinetics, the correct definition of electrochromic memory was made and a relation of memory was obtained. It was also found that at the initial time of natural bleaching, the change rate of proton concentration in the film was also obtained. According to the mechanism of electrochromic memory, it was indicated that in the open circuit case, the theoretical reaction of the change rate of electric potential was in good agrement with the experimental results, and furthermore, the reaction constant was determined with the experimental data. In the short circuit case, there exist two effects on degradation, the short circuit current caused by the backward emf, and the oxidation of the colored film. The experimental data shows that, in the short circuit case, the degradation strongly depends on the short circuit current and the effect of chemical reaction can be neglected.

  15. Structural stability of hydrogenated amorphous carbon overcoats used in heat-assisted magnetic recording investigated by rapid thermal annealing

    KAUST Repository

    Wang, N.

    2013-01-01

    Ultrathin amorphous carbon (a-C) films are extensively used as protective overcoats of magnetic recording media. Increasing demands for even higher storage densities have necessitated the development of new storage technologies, such as heat-assisted magnetic recording (HAMR), which uses laser-assisted heating to record data on high-stability media that can store single bits in extremely small areas (∼1 Tbit/in.2). Because HAMR relies on locally changing the coercivity of the magnetic medium by raising the temperature above the Curie temperature for data to be stored by the magnetic write field, it raises a concern about the structural stability of the ultrathin a-C film. In this study, rapid thermal annealing (RTA) experiments were performed to examine the thermal stability of ultrathin hydrogenated amorphous carbon (a-C:H) films deposited by plasma-enhanced chemical vapor deposition. Structural changes in the a-C:H films caused by RTA were investigated by x-ray photoelectron spectroscopy, Raman spectroscopy, x-ray reflectivity, and conductive atomic force microscopy. The results show that the films exhibit thermal stability up to a maximum temperature in the range of 400-450 °C. Heating above this critical temperature leads to hydrogen depletion and sp 2 clustering. The critical temperature determined by the results of this study represents an upper bound of the temperature rise due to laser heating in HAMR hard-disk drives and the Curie temperature of magnetic materials used in HAMR hard disks. © 2013 American Institute of Physics.

  16. Optical characterization of sputtered carbon films

    Energy Technology Data Exchange (ETDEWEB)

    Ager, J.W. III.

    1992-05-01

    Spattered carbon films are widely used as protective overcoats for thin film disk media. Raman spectroscopy is nondestructive and relatively rapid and is well suited for the characterization of carbon films. Specific features in the Raman spectra are empirically correlated with the rates of specific types of mechanical wear for both hydrogenated and unhydrogenated films. This observation is interpreted in terms of a random covalent network, in which the mechanical performance of the film is determined by the nature of the bonding that links sp{sup 2}-bonded domains.

  17. The effect of empirical potential functions on modeling of amorphous carbon using molecular dynamics method

    International Nuclear Information System (INIS)

    Empirical potentials have a strong effect on the hybridization and structure of amorphous carbon and are of great importance in molecular dynamics (MD) simulations. In this work, amorphous carbon at densities ranging from 2.0 to 3.2 g/cm3 was modeled by a liquid quenching method using Tersoff, 2nd REBO, and ReaxFF empirical potentials. The hybridization, structure and radial distribution function G(r) of carbon atoms were analyzed as a function of the three potentials mentioned above. The ReaxFF potential is capable to model the change of the structure of amorphous carbon and MD results are in a good agreement with experimental results and density function theory (DFT) at low density of 2.6 g/cm3 and below. The 2nd REBO potential can be used when amorphous carbon has a very low density of 2.4 g/cm3 and below. Considering the computational efficiency, the Tersoff potential is recommended to model amorphous carbon at a high density of 2.6 g/cm3 and above. In addition, the influence of the quenching time on the hybridization content obtained with the three potentials is discussed.

  18. The effect of empirical potential functions on modeling of amorphous carbon using molecular dynamics method

    Energy Technology Data Exchange (ETDEWEB)

    Li, Longqiu, E-mail: longqiuli@gmail.com [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin, 150001 (China); Xu, Ming; Song, Wenping [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin, 150001 (China); Ovcharenko, Andrey [Western Digital Corporation, San Jose, CA (United States); Zhang, Guangyu; Jia, Ding [School of Mechatronics Engineering, Harbin Institute of Technology, Harbin, 150001 (China)

    2013-12-01

    Empirical potentials have a strong effect on the hybridization and structure of amorphous carbon and are of great importance in molecular dynamics (MD) simulations. In this work, amorphous carbon at densities ranging from 2.0 to 3.2 g/cm{sup 3} was modeled by a liquid quenching method using Tersoff, 2nd REBO, and ReaxFF empirical potentials. The hybridization, structure and radial distribution function G(r) of carbon atoms were analyzed as a function of the three potentials mentioned above. The ReaxFF potential is capable to model the change of the structure of amorphous carbon and MD results are in a good agreement with experimental results and density function theory (DFT) at low density of 2.6 g/cm{sup 3} and below. The 2nd REBO potential can be used when amorphous carbon has a very low density of 2.4 g/cm{sup 3} and below. Considering the computational efficiency, the Tersoff potential is recommended to model amorphous carbon at a high density of 2.6 g/cm{sup 3} and above. In addition, the influence of the quenching time on the hybridization content obtained with the three potentials is discussed.

  19. PLD Preparation of GeS6 Amorphous Film and Investigation on Its Photo-induced Darkening Phenomenon

    Institute of Scientific and Technical Information of China (English)

    LIU Gang; GU Shaoxuan; ZHANG Haochun; ZHANG Ning; TAO Haizheng

    2014-01-01

    GeS6 chalcogenide amorphous film was deposited on glass substrate via PLD (pulsed laser deposition) technique. The performance and structure of the film was characterized by XRD (X-ray diffraction), SEM (Scanning Electron Microscopy), EDS (Energy Dispersive Spectroscopy), optical transmission spectra, and Raman spectra, etc. The GeS6 amorphous film was irradiated by 532 nm linearly polarized light, and its photo-induced darkening was investigated. The results showed that the GeS6 chalcogenide amorphous film was smooth and compact with uniform thickness and combined with the substrate firmly, and its chemical composition was in consistency with the bulky target. When laser energy was fixed, the transparence of the film declined with the increase of the laser irradiation time. Obvious photo-induced darkening and relaxation phenomenon of the film after laser irradiation were observed in this investigation.

  20. Gallium-lanthanum-sulphide amorphous thin films prepared by pulsed laser deposition

    International Nuclear Information System (INIS)

    Thin amorphous gallium-lanthanum-sulphide films were prepared by pulsed laser deposition method. The prepared layers were characterized in terms of the structure (using Raman scattering spectroscopy), chemical composition (by energy-dispersive X-ray analysis), and optical properties (employing variable angle spectroscopic ellipsometry). Following Raman spectroscopy results, it is supposed that the structure of the bulk glass and corresponding thin films is formed by GaS4 tetrahedra and LaS8 structural units. The study of photo- and thermally induced phenomena in prepared amorphous chalcogenides shows photoinduced decrease of refractive index (∼1-2%) under cw (473 nm) or pulsed (248 nm) laser irradiation and annealing-induced decrease of refractive index (∼2%), respectively.

  1. Gallium-lanthanum-sulphide amorphous thin films prepared by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Nemec, P., E-mail: Petr.Nemec@upce.cz [Department of General and Inorganic Chemistry, Faculty of Chemical Technology, University of Pardubice, Legions Sq. 565, 53210 Pardubice (Czech Republic); Nazabal, V., E-mail: virginie.nazabal@univ-rennes1.fr [Equipe Verres et Ceramiques, UMR-CNRS 6226, Sciences Chimiques de Rennes (SCR), Universite de Rennes 1, 35042 Rennes (France); Pavlista, M., E-mail: martin.pavlista@upce.cz [Department of Physics, Faculty of Chemical Technology, University of Pardubice, Studentska 84, 53210 Pardubice (Czech Republic); Moreac, A., E-mail: alain.moreac@univ-rennes1.fr [GMCM, UMR-CNRS 6626, Universite de Rennes 1, 35042 Rennes (France); Frumar, M., E-mail: miloslav.frumar@upce.cz [Department of General and Inorganic Chemistry, Faculty of Chemical Technology, University of Pardubice, Legions Sq. 565, 53210 Pardubice (Czech Republic); Vlcek, M., E-mail: milan.vlcek@upce.cz [Joint Laboratory of Solid State Chemistry of the University of Pardubice and the Institute of Macromolecular Chemistry of Acad. Sci. of the Czech Republic, Studentska 84, 53210 Pardubice (Czech Republic)

    2009-09-15

    Thin amorphous gallium-lanthanum-sulphide films were prepared by pulsed laser deposition method. The prepared layers were characterized in terms of the structure (using Raman scattering spectroscopy), chemical composition (by energy-dispersive X-ray analysis), and optical properties (employing variable angle spectroscopic ellipsometry). Following Raman spectroscopy results, it is supposed that the structure of the bulk glass and corresponding thin films is formed by GaS{sub 4} tetrahedra and LaS{sub 8} structural units. The study of photo- and thermally induced phenomena in prepared amorphous chalcogenides shows photoinduced decrease of refractive index ({approx}1-2%) under cw (473 nm) or pulsed (248 nm) laser irradiation and annealing-induced decrease of refractive index ({approx}2%), respectively.

  2. Preparation of self-supporting carbon thin films

    CERN Document Server

    Lommel, B; Kindler, B; Klemm, J; Steiner, J

    2002-01-01

    For heavy-ion beam experiments, self-supporting carbon thin films are needed as targets, stripper foils and as backings (Nucl. Instr. and Meth. A 334 (1993) 69) for materials which cannot be produced self-supporting. Using resistance evaporation under high vacuum, self-supporting carbon foils with a thickness of 5 mu g/cm sup 2 and a diameter of 10 mm, a thickness of 10 mu g/cm sup 2 and a diameter of 50 mm up to a thickness of 50 mu g/cm sup 2 and a diameter of 300 mm can be obtained. Due to the energy impact of the heavy-ion beam, the amorphous carbon is restructured into textured graphite, as was found already by Dollinger et al. (Nucl. Instr. and Meth. A 303 (1991) 79). The discuss the production process as well as the change of the layer structure caused by the energy deposit.

  3. Amorphous intergranular films act as ultra-efficient point defect sinks during collision cascades

    OpenAIRE

    Ludy, Joseph E.; Rupert, Timothy J.

    2015-01-01

    Atomistic simulations are used to explore the effect of interfacial structure on residual radiation damage. Specifically, an ordered grain boundary is compared to a disordered amorphous intergranular film, to investigate how interface thickness and free volume impacts point defect recombination. The collision cascades induced by neutron bombardment are simulated and residual point defect populations are analyzed as a function of boundary type and primary knock on atom energy. While ordered gr...

  4. Nitrogen effects on crystallization kinetics of amorphous TiOxNy thin films

    OpenAIRE

    Hukari, Kyle; Dannenberg, Rand; Stach, E. A.

    2001-01-01

    The crystallization behavior of amorphous TiOxNy (x>>y) thin films was investigated by in-situ transmission electron microscopy. The Johnson-Mehl-Avrami-Kozolog (JMAK) theory is used to determine the Avrami exponent, activation energy, and the phase velocity pre-exponent. Addition of nitrogen inhibits diffusion, increasing the nucleation temperature, while decreasing the growth activation energy. Kinetic variables extracted from individual crystallites are compared to JMAK analysis of t...

  5. Failure analysis of thin-film amorphous-silicon solar-cell modules

    Science.gov (United States)

    Kim, Q.

    1984-01-01

    A failure analysis of thin film amorphous silicon solar cell modules was conducted. The purpose of this analysis is to provide information and data for appropriate corrective action that could result in improvements in product quality and reliability. Existing techniques were expanded in order to evaluate and characterize degradational performance of a-Si solar cells. Microscopic and macroscopic defects and flaws that significantly contribute to performance degradation were investigated.

  6. Development of spin-on carbon hardmasks with comparable etch resistance to Amorphous Carbon Layer (ACL)

    Science.gov (United States)

    Cheon, Hwan-Sung; Yoon, Kyong-Ho; Kim, Min-Soo; Oh, Seung Bae; Song, Jee-Yun; Tokareva, Nataliya; Kim, Jong-Seob; Chang, Tuwon

    2008-11-01

    In recent microlithography of semiconductor fabrication, spin-on hardmask (SOH) process continue to gain popularity as it replaces the traditional SiON/ACL hardmask scheme which suffers from high CoO, low productivity, particle contamination, and layer alignment issues. In the SOH process, organic polymer with high carbon content is spin-cast to form a carbon hardmask film. In the previous papers, we reported the development of organic SOH materials and their application in sub-70 nm lithography. In this paper, we describe the synthesis of organic polymers with very high carbon contents (>92 wt.%) and the evaluation of the spin-coated films for the hardmask application. The high carbon content of the polymer ensures improved etch resistance which amounts to >90% of ACL's resistance. However, as the carbon content of the polymers increases, the solubility in common organic solvents becomes lower. Here we report the strategies to improve the solubility of the high carbon content resins and optimization of the film properties for the SOH application.

  7. The effect of RF power on tribological properties of the diamond-like carbon films

    International Nuclear Information System (INIS)

    DLC thin films were prepared by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) method on silicon substrates using methane (CH4), hydrogen (H2) and gas mixture. We have checked the influence of varying RF power on DLC film. The Raman spectroscopy shows the diamond-like carbon (DLC) amorphous structure of the films. AFM images show the surface roughness of the DLC film decrease with increasing RF power. Also, the friction coefficients were investigated by atomic force microscope (AFM) in friction force microscope (FFM) mode

  8. Large-deformation and high-strength amorphous porous carbon nanospheres.

    Science.gov (United States)

    Yang, Weizhu; Mao, Shimin; Yang, Jia; Shang, Tao; Song, Hongguang; Mabon, James; Swiech, Wacek; Vance, John R; Yue, Zhufeng; Dillon, Shen J; Xu, Hangxun; Xu, Baoxing

    2016-01-01

    Carbon is one of the most important materials extensively used in industry and our daily life. Crystalline carbon materials such as carbon nanotubes and graphene possess ultrahigh strength and toughness. In contrast, amorphous carbon is known to be very brittle and can sustain little compressive deformation. Inspired by biological shells and honeycomb-like cellular structures in nature, we introduce a class of hybrid structural designs and demonstrate that amorphous porous carbon nanospheres with a thin outer shell can simultaneously achieve high strength and sustain large deformation. The amorphous carbon nanospheres were synthesized via a low-cost, scalable and structure-controllable ultrasonic spray pyrolysis approach using energetic carbon precursors. In situ compression experiments on individual nanospheres show that the amorphous carbon nanospheres with an optimized structure can sustain beyond 50% compressive strain. Both experiments and finite element analyses reveal that the buckling deformation of the outer spherical shell dominates the improvement of strength while the collapse of inner nanoscale pores driven by twisting, rotation, buckling and bending of pore walls contributes to the large deformation. PMID:27072412

  9. Large-deformation and high-strength amorphous porous carbon nanospheres

    Science.gov (United States)

    Yang, Weizhu; Mao, Shimin; Yang, Jia; Shang, Tao; Song, Hongguang; Mabon, James; Swiech, Wacek; Vance, John R.; Yue, Zhufeng; Dillon, Shen J.; Xu, Hangxun; Xu, Baoxing

    2016-04-01

    Carbon is one of the most important materials extensively used in industry and our daily life. Crystalline carbon materials such as carbon nanotubes and graphene possess ultrahigh strength and toughness. In contrast, amorphous carbon is known to be very brittle and can sustain little compressive deformation. Inspired by biological shells and honeycomb-like cellular structures in nature, we introduce a class of hybrid structural designs and demonstrate that amorphous porous carbon nanospheres with a thin outer shell can simultaneously achieve high strength and sustain large deformation. The amorphous carbon nanospheres were synthesized via a low-cost, scalable and structure-controllable ultrasonic spray pyrolysis approach using energetic carbon precursors. In situ compression experiments on individual nanospheres show that the amorphous carbon nanospheres with an optimized structure can sustain beyond 50% compressive strain. Both experiments and finite element analyses reveal that the buckling deformation of the outer spherical shell dominates the improvement of strength while the collapse of inner nanoscale pores driven by twisting, rotation, buckling and bending of pore walls contributes to the large deformation.

  10. Structure and Optical Properties of Silicon Nanocrystals Embedded in Amorphous Silicon Thin Films Obtained by PECVD

    Directory of Open Access Journals (Sweden)

    B. M. Monroy

    2011-01-01

    Full Text Available Silicon nanocrystals embedded in amorphous silicon matrix were obtained by plasma enhanced chemical vapor deposition using dichlorosilane as silicon precursor. The RF power and dichlorosilane to hydrogen flow rate ratio were varied to obtain different crystalline fractions and average sizes of silicon nanocrystals. High-resolution transmission electron microscopy images and RAMAN measurements confirmed the existence of nanocrystals embedded in the amorphous matrix with average sizes between 2 and 6 nm. Different crystalline fractions (from 12% to 54% can be achieved in these films by regulating the selected growth parameters. The global optical constants of the films were obtained by UV-visible transmittance measurements. Effective band gap variations from 1.78 to 2.3 eV were confirmed by Tauc plot method. Absorption coefficients higher than standard amorphous silicon were obtained in these thin films for specific growth parameters. The relationship between the optical properties is discussed in terms of the different internal nanostructures of the samples.

  11. Amorphous lanthanum lutetium oxide thin films as an alternative high-k gate dielectric

    OpenAIRE

    Lopes, J. M. J.; Roeckerath, M.; Schlom, D. G.; Heeg, T.; Rije, E.; Schubert, J; Mantl, S.; Afanas'ev, V.V.; Shamuilia, S.; Stesmans, A.; Jia, Y.

    2006-01-01

    Lanthanum lutetium oxide thin films were grown on (100) Si by pulsed laser deposition. Rutherford backscattering spectrometry, atomic force microscopy, x-ray diffraction, and x-ray reflectometry were employed to investigate the samples. The results indicate the growth of stoichiometric and smooth LaLuO3 films that remain amorphous up to 1000 degrees C. Internal photoemission and photoconductivity measurements show a band gap width of 5.2 +/- 0.1 eV and symmetrical conduction and valence band ...

  12. A new drain current model for amorphous IGZO thin film transistors

    Science.gov (United States)

    Qiang, Lei; Yao, Ruo-He

    2015-04-01

    Based on the conduction mechanisms of amorphous InGaZnO (a-IGZO) thin film transistors, generalized equations are derived which permit the determination of drain current characteristics. A geometry-independent definition for field effect mobility considering the ratio of free-to-trapped carriers is introduced, which conveys the properties of the active semiconducting layer. It is suggested that a drain current model that includes different charge transports gives a consistent and accurate description of the electrical behavior. The good agreement between measured and calculated results confirms the efficiency of this model for the design of integrated large-area thin-film circuits.

  13. Effects of thickness on the statistical properties of the Barkhausen noise in amorphous films

    International Nuclear Information System (INIS)

    The statistical properties of the Barkhausen noise (BN) in thin amorphous films are studied as a function of both the nominal composition and the thickness. BN was observed in single films with nominal compositions Fe73.5Cu1Nb3Si22.5-xBx (with x=4 and 9) in the thickness range 20nm-5μm. The distributions of Barkhausen jump sizes and duration times were obtained and fitted to power laws with critical exponents τ=1.25+/-0.05 and α=1.60+/-0.05, respectively

  14. Dry Etching Characteristics of Amorphous Indium-Gallium-Zinc-Oxide Thin Films

    Institute of Scientific and Technical Information of China (English)

    郑艳彬; 李光; 王文龙; 李秀昌; 姜志刚

    2012-01-01

    Amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistor (TFT) backplane technology is the best candidate for flat panel displays (FPDs). In this paper, a-IGZO TFT structures are described. The effects of etch parameters (rf power, dc-bias voltage and gas pressure) on the etch rate and etch profile are discussed. Three kinds of gas mixtures are compared in the dry etching process of a-IGZO thin films. Lastly, three problems are pointed out that need to be addressed in the dry etching process of a-IGZO TFTs.

  15. Aluminium-induced crystallization of amorphous silicon films deposited by DC magnetron sputtering on glasses

    International Nuclear Information System (INIS)

    Amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) films were deposited by DC magnetron sputtering technique with argon and hydrogen plasma mixture on Al deposited by thermal evaporation on glass substrates. The a-Si/Al and a-Si:H/Al thin films were annealed at different temperatures ranging from 250 to 550 deg. C during 4 h in vacuum-sealed bulb. The effects of annealing temperature on optical, structural and morphological properties of as-grown as well as the vacuum-annealed a-Si/Al and a-Si:H/Al thin films are presented in this contribution. The averaged transmittance of a-Si:H/Al film increases upon increasing the annealing temperature. XRD measurements clearly evidence that crystallization is initiated at 450 deg. C. The number and intensity of diffraction peaks appearing in the diffraction patterns are more important in a-Si:H/Al than that in a-Si/Al layers. Results show that a-Si:H films deposited on Al/glass crystallize above 450 deg. C and present better crystallization than the a-Si layers. The presence of hydrogen induces an improvement of structural properties of poly-Si prepared by aluminium-induced crystallization (AIC).

  16. Aluminium-induced crystallization of amorphous silicon films deposited by DC magnetron sputtering on glasses

    Energy Technology Data Exchange (ETDEWEB)

    Kezzoula, F., E-mail: kezzoula@usa.com [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria); Laboratory of Materials, Mineral and Composite (LMMC), Boumerdes University (Algeria); Hammouda, A. [UPR CNRS 3079 CEMHTI - 1D Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2 (France); Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Universite d' Orleans, 45067 Orleans Cedex 2 (France); Kechouane, M. [Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Simon, P. [UPR CNRS 3079 CEMHTI - 1D Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2 (France); Universite d' Orleans, 45067 Orleans Cedex 2 (France); Abaidia, S.E.H. [Laboratory of Materials, Mineral and Composite (LMMC), Boumerdes University (Algeria); Keffous, A. [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria); Cherfi, R. [Equipe Couches Minces, Laboratoire de Physique des Materiaux, Faculte de Physique, USTHB, Algiers (Algeria); Menari, H.; Manseri, A. [UDTS 2Bd Frantz Fanon 7 merveilles Algiers (Algeria)

    2011-09-15

    Amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) films were deposited by DC magnetron sputtering technique with argon and hydrogen plasma mixture on Al deposited by thermal evaporation on glass substrates. The a-Si/Al and a-Si:H/Al thin films were annealed at different temperatures ranging from 250 to 550 deg. C during 4 h in vacuum-sealed bulb. The effects of annealing temperature on optical, structural and morphological properties of as-grown as well as the vacuum-annealed a-Si/Al and a-Si:H/Al thin films are presented in this contribution. The averaged transmittance of a-Si:H/Al film increases upon increasing the annealing temperature. XRD measurements clearly evidence that crystallization is initiated at 450 deg. C. The number and intensity of diffraction peaks appearing in the diffraction patterns are more important in a-Si:H/Al than that in a-Si/Al layers. Results show that a-Si:H films deposited on Al/glass crystallize above 450 deg. C and present better crystallization than the a-Si layers. The presence of hydrogen induces an improvement of structural properties of poly-Si prepared by aluminium-induced crystallization (AIC).

  17. Growth and interface of amorphous La2Hf2O7/Si thin film

    Institute of Scientific and Technical Information of China (English)

    CHENG Xuerui; QI Zeming; ZHANG Huanjun; ZHANG Guobin; PAN Guoqiang

    2012-01-01

    Amorphous La2Hf2O7 thin films were deposited on Si(100) substrate by pulsed laser deposition (PLD) method under different conditions.The interfacial states of the La2Hf2O7/Si films were studied by synchrotron X-ray reflectivity (XRR) and X-ray photoelectron spec-troscopy (XPS).When grown under vacuum condition,silicate,silicide and few SiOx were formed in the interface layer.However,the Hf-silicide formation could be effectively eliminated by the ambient oxygen pressure during film growth.The result revealed that the La2Hf2O7/Si interlayer was intimately related with growth condition.Insufficient supply of oxygen would cause Hf-silicide formation at the interface and it could be most effectively controlled by the ambient oxygen pressure during film growth.

  18. Electrochromic and electrochemical properties of amorphous porous nickel hydroxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Inamdar, A.I. [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Sonavane, A.C. [Thin Films Materials Laboratory, Department of physics, Shivaji University, Kolhapur 416 004 (India); Pawar, S.M. [Department of Materials Science and Engineering, Chonnam National University, Gwangju 500-757 (Korea, Republic of); Kim, YoungSam [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Kim, J.H. [Department of Materials Science and Engineering, Chonnam National University, Gwangju 500-757 (Korea, Republic of); Patil, P.S. [Thin Films Materials Laboratory, Department of physics, Shivaji University, Kolhapur 416 004 (India); Jung, Woong [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Im, Hyunsik, E-mail: hyunsik7@dongguk.edu [Department of Semiconductor Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Kim, Dae-Young [Department of Biological and Environmental Science, Dongguk University, Seoul 100-715 (Korea, Republic of); Kim, Hyungsang [Department of Physics, Dongguk University, Seoul 100-715 (Korea, Republic of)

    2011-09-01

    Nickel hydroxide films were prepared using the chemical bath deposition (CBD) technique. The amorphous nature of the films was confirmed by X-ray diffraction measurements. X-ray photoelectron spectroscopy (XPS) measurements showed that the films exhibited nickel hydroxide nature. The porosity of the films was studied using optical measurements. The electrochromic properties of the porous nickel hydroxide layers were investigated, using cyclic voltammetry, chronoamperometry, in situ transmittance, UV-vis spectroscopy, and impedance spectroscopy. The change in the optical density ({Delta}OD) was found to be 0.79 for the as-deposited nickel hydroxide films, whereas it is 0.53 and 0.50 for the films annealed at 150 deg. C and 200 deg. C, respectively. The in situ transmittance and chronoamperometry curves revealed that the annealed films had a very fast colouration (t{sub c} < 290 ms) and decolouration (t{sub b} < 130 ms). The measured colouration efficiencies range between 30 and 40 cm{sup 2}/C. The impedance measurements revealed the faster colouration and good electrochromic properties for the annealed nickel hydroxide films.

  19. Intrinsic stress analysis of sputtered carbon film

    Institute of Scientific and Technical Information of China (English)

    Liqin Liu; Zhanshan Wang; Jingtao Zhu; Zhong Zhang; Moyan Tan; Qiushi Huang; Rui Chen; Jing Xu; Lingyan Chen

    2008-01-01

    Intrinsic stresses of carbon films deposited by direct current (DC) magnetron sputtering were investigated.The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses.The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition.By varying argon pressure and target-substrate distance,energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level.The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.

  20. Direct measurement of free-energy barrier to nucleation of crystallites in amorphous silicon thin films

    Science.gov (United States)

    Shi, Frank G.

    1994-01-01

    A method is introduced to measure the free-energy barrier W(sup *), the activation energy, and activation entropy to nucleation of crystallites in amorphous solids, independent of the energy barrier to growth. The method allows one to determine the temperature dependence of W(sup *), and the effect of the preparation conditions of the initial amorphous phase, the dopants, and the crystallization methds on W(sup *). The method is applied to determine the free-energy barrier to nucleation of crystallites in amorphous silicon (a-Si) thin films. For thermally induced nucleation in a-Si thin films with annealing temperatures in the range of from 824 to 983 K, the free-energy barrier W(sup *) to nucleation of silicon crystals is about 2.0 - 2.1 eV regardless of the preparation conditions of the films. The observation supports the idea that a-Si transforms into an intermediate amorphous state through the structural relaxation prior to the onset of nucleation of crystallites in a-Si. The observation also indicates that the activation entropy may be an insignificant part of the free-energy barrier for the nucleation of crystallites in a-Si. Compared with the free-energy barrier to nucleation of crystallites in undoped a-Si films, a significant reduction is observed in the free-energy barrier to nucleation in Cu-doped a-Si films. For a-Si under irradiation of Xe(2+) at 10(exp 5) eV, the free-energy barrier to ion-induced nucleation of crystallites is shown to be about half of the value associated with thermal-induced nucleation of crystallites in a-Si under the otherwise same conditions, which is much more significant than previously expected. The present method has a general kinetic basis; it thus should be equally applicable to nucleation of crystallites in any amorphous elemental semiconductors and semiconductor alloys, metallic and polymeric glasses, and to nucleation of crystallites in melts and solutions.

  1. Polycrystalline VO{sub 2} thin films via femtosecond laser processing of amorphous VO{sub x}

    Energy Technology Data Exchange (ETDEWEB)

    Charipar, N.A.; Kim, H.; Charipar, K.M.; Mathews, S.A.; Pique, A. [Naval Research Laboratory, Materials Science and Technology Division, Washington, DC (United States); Breckenfeld, E. [National Research Council Fellow at the Naval Research Laboratory, Washington, DC (United States)

    2016-05-15

    Femtosecond laser processing of pulsed laser-deposited amorphous vanadium oxide thin films was investigated. Polycrystalline VO{sub 2} thin films were achieved by femtosecond laser processing in air at room temperature. The electrical transport properties, crystal structure, surface morphology, and optical properties were characterized. The laser-processed films exhibited a metal-insulator phase transition characteristic of VO{sub 2}, thus presenting a pathway for the growth of crystalline vanadium dioxide films on low-temperature substrates. (orig.)

  2. Determination of photocatalytic activity in amorphous and crystalline titanium oxide films prepared using plasma-enhanced chemical vapor deposition

    Science.gov (United States)

    Wu, Cheng-Yang; Chiang, Bo-Sheng; Chang, Springfield; Liu, Day-Shan

    2011-01-01

    Hydro-oxygenated amorphous titanium oxide (a-TiO x:OH) films were prepared by plasma-enhanced chemical vapor deposition (PECVD) using precursors of titanium tetraisopropoxide (TTIP) and oxygen. The influences of chemical states and crystal quality on the photocatalytic activity were systematically investigated in the as-deposited and post-annealed films. The degree of the photocatalytic activity was deeply correlated with the porosity related to the hydroxyl (OH) groups in the as-deposited amorphous film. The crystallized anatase structures was observed from the 200 °C-deposited a-TiO x:OH film after a post-annealing treatment at 400 °C. The photocatalytic activity related to the film with anatase structure was markedly superior to that of an amorphous film with porous structures. The larger the crystal size of the anatase structure, the higher the photocatalytic activity obtained. At elevated annealed temperatures, the inferior anatase structure due to the crystalline transformation led to a low photocatalytic activity. It was concluded that the photocatalytic activity of an amorphous TiO x film prepared using PECVD was determined by the porosity originating from the functional OH groups in the film, whereas the crystalline quality of anatase phase in the annealed poly-TiO x film was crucial to the photocatalytic activity.

  3. Piezoresistive effect in carbon nanotube films

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    The piezoresistive effect of the pristine carbon nanotube (CNT) films has been studied. Carbon nanotubes were synthesized by hot filament chemical vapor deposition. The piezoresistive effect in the pristine CNT films was studied by a three-point bending test. The gauge factor for the pristine CNT films under 500 microstrains was found to be at least 65 at room temperature, and increased with temperature, exceeding that of polycrystalline silicon (30) at 35℃. The origin of the piezoresistivity in CNT films may be ascribed to a pressure-induced change in the band gap and the defects.

  4. Computational Evaluation of Amorphous Carbon Coating for Durable Silicon Anodes for Lithium-Ion Batteries

    OpenAIRE

    Jeongwoon Hwang; Jisoon Ihm; Kwang-Ryeol Lee; Seungchul Kim

    2015-01-01

    We investigate the structural, mechanical, and electronic properties of graphite-like amorphous carbon coating on bulky silicon to examine whether it can improve the durability of the silicon anodes of lithium-ion batteries using molecular dynamics simulations and ab-initio electronic structure calculations. Structural models of carbon coating are constructed using molecular dynamics simulations of atomic carbon deposition with low incident energies (1–16 eV). As the incident energy decrease...

  5. Measurement of the magnetostriction constants of amorphous thin films on kapton substrates

    Science.gov (United States)

    Ouyang, C.; Kim, T. W.; Gambino, R. J.; Jahnes, C.

    1998-06-01

    The saturation magnetostriction constants of thin films of amorphous Co39Ni31Fe8Si8B14 and CoZrTb have been measured either by the small angle magnetization rotation (SAMR) method or by the initial susceptibility method. The SAMR method is used for the soft materials. When the material is magnetically hard or has a strong perpendicular anisotropy, the initial susceptibility method is used. It is found that the amorphous Co39Ni31Fe8Si8B14 prepared by ion beam deposition from an alloy target shows very soft magnetic properties and has a very small negative saturation magnetostriction, λs, of -1×10-7. Sputtered films of CoZrTb show a strong perpendicular anisotropy when the concentration of Tb is high. We have found that the SAMR method can be applied to CoZrTb films when the Tb content is low. The saturation magnetostricition constant of a sputtered film of Co78.4Zr20.8Tb0.8 is 2×106. When the Tb content is high, however, the initial susceptibility method is used to measure magnetostriction.

  6. Ceramics and amorphous thin films based on gallium sulphide doped by rare-earth sulphides

    International Nuclear Information System (INIS)

    Bulk ceramics of Ga2S3 and rare-earth sulfides (EuS, Gd2S3, Er2S3) as well as combinations thereof have been prepared by spark plasma sintering (SPS). The disk-shaped ceramics were used as targets for pulsed laser deposition (PLD) experiments to obtain amorphous thin films. The properties of these new bulks and amorphous thin films have been investigated by x-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDX), optical transmission spectroscopy, and atomic force microscopy (AFM). In order to test the photoexpansion effect in Ga2S3 and the possibility to create planar arrays of microlenses, the film was irradiated with femtosecond laser pulses at different powers. For low laser power pulses (up to 100 mW power per pulse) a photoexpansion effect was observed, which leads to formation of hillocks with a height of 40–50 nm. EuS doped Ga2S3 thin film shows luminescence properties, which recommend them for optoelectronic applications. (invited article)

  7. Optimizing amorphous indium zinc oxide film growth for low residual stress and high electrical conductivity

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, Mukesh [Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO 80401 (United States); Sigdel, A.K. [Department of Physics and Astronomy, University of Denver, Denver, CO 80208 (United States); National Center for Photovoltaics, National Renewal Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401 (United States); Gennett, T.; Berry, J.J.; Perkins, J.D.; Ginley, D.S. [National Center for Photovoltaics, National Renewal Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401 (United States); Packard, C.E., E-mail: cpackard@mines.edu [Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO 80401 (United States); National Center for Photovoltaics, National Renewal Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401 (United States)

    2013-10-15

    With recent advances in flexible electronics, there is a growing need for transparent conductors with optimum conductivity tailored to the application and nearly zero residual stress to ensure mechanical reliability. Within amorphous transparent conducting oxide (TCO) systems, a variety of sputter growth parameters have been shown to separately impact film stress and optoelectronic properties due to the complex nature of the deposition process. We apply a statistical design of experiments (DOE) approach to identify growth parameter–material property relationships in amorphous indium zinc oxide (a-IZO) thin films and observed large, compressive residual stresses in films grown under conditions typically used for the deposition of highly conductive samples. Power, growth pressure, oxygen partial pressure, and RF power ratio (RF/(RF + DC)) were varied according to a full-factorial test matrix and each film was characterized. The resulting regression model and analysis of variance (ANOVA) revealed significant contributions to the residual stress from individual growth parameters as well as interactions of different growth parameters, but no conditions were found within the initial growth space that simultaneously produced low residual stress and high electrical conductivity. Extrapolation of the model results to lower oxygen partial pressures, combined with prior knowledge of conductivity–growth parameter relationships in the IZO system, allowed the selection of two promising growth conditions that were both empirically verified to achieve nearly zero residual stress and electrical conductivities >1480 S/cm. This work shows that a-IZO can be simultaneously optimized for high conductivity and low residual stress.

  8. Amorphous carbon for structured step bunching during graphene growth on SiC

    Science.gov (United States)

    Palmer, James; Kunc, Jan; Hu, Yike; Hankinson, John; Guo, Zelei; Berger, Claire; de Heer, Walt

    2014-03-01

    Structured growth of high quality graphene is necessary for technological development of carbon based materials. Specifically, control of the bunching and placement of surface steps under epitaxial graphene on SiC is an important consideration for graphene device production. We demonstrate lithographically patterned evaporated amorphous carbon as a method to pin SiC surface steps. Evaporated amorphous carbon is an ideal step-flow barrier on SiC due to its chemical compatibility with graphene growth and its structural stability at high temperatures, as well as its patternability. The amorphous carbon is deposited in vacuum on SiC prior to graphene growth. In the graphene furnace at temperatures above 1200°C, mobile SiC steps accumulate at these amorphous carbon barriers, forming an aligned step free region for graphene growth at temperatures above 1330°C. AFM imaging and Raman spectroscopy support the formation of quality step-free graphene sheets grown on SiC with the step morphology aligned to the carbon grid.

  9. Transition metal oxide window layer in thin film amorphous silicon solar cells

    International Nuclear Information System (INIS)

    Pin-type hydrogenated amorphous silicon solar cells have been fabricated by replacing state of the art silicon based window layer with more transparent transition metal oxide (TMO) materials. Three kinds of TMOs: vanadium oxide, tungsten oxide, and molybdenum oxide (MoOx) were comparatively investigated to reveal the design principles of metal oxide window layers. It was found that MoOx exhibited the best performance due to its higher work function property compared to other materials. In addition, the band alignment between MoOx and amorphous Si controls the series resistance, which was verified through compositional variation of MoOx thin films. The design principles of TMO window layer in amorphous Si solar cells are summarized as follows: A wide optical bandgap larger than 3.0 eV, a high work function larger than 5.2 eV, and a band alignment condition rendering efficient hole collection from amorphous Si absorber layer. - Highlights: • High work function metal oxides can potentially replace the conventional p-a-SiC. • V2Ox, WOx, and MoOx are comparatively investigated in this study. • MoOx is the most relevant material due to its highest work function. • Slightly oxygen deficient MoOx exhibited performance enhancement at x = 2.9

  10. Photoluminescence and Raman Spectroscopy Studies of Carbon Nitride Films

    Directory of Open Access Journals (Sweden)

    J. Hernández-Torres

    2016-01-01

    Full Text Available Amorphous carbon nitride films with N/C ratios ranging from 2.24 to 3.26 were deposited by reactive sputtering at room temperature on corning glass, silicon, and quartz as substrates. The average chemical composition of the films was obtained from the semiquantitative energy dispersive spectroscopy analysis. Photoluminescence measurements were performed to determine the optical band gap of the films. The photoluminescence spectra displayed two peaks: one associated with the substrate and the other associated with CNx films located at ≈2.13±0.02 eV. Results show an increase in the optical band gap from 2.11 to 2.15 eV associated with the increase in the N/C ratio. Raman spectroscopy measurements showed a dominant D band. ID/IG ratio reaches a maximum value for N/C ≈ 3.03 when the optical band gap is 2.12 eV. Features observed by the photoluminescence and Raman studies have been associated with the increase in the carbon sp2/sp3 ratio due to presence of high nitrogen content.

  11. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Directory of Open Access Journals (Sweden)

    Yaser Abdulraheem

    2014-05-01

    Full Text Available An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si wafers by plasma enhanced chemical vapor deposition (PECVD. The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause

  12. Phosphorus- and boron-doped hydrogenated amorphous silicon films prepared using vaporized liquid cyclopentasilane

    Energy Technology Data Exchange (ETDEWEB)

    Masuda, Takashi, E-mail: mtakashi@jaist.ac.jp [Japan Advanced Institute of Science and Technology, Nomi, Ishikawa, 923-1292 (Japan); Takagishi, Hideyuki; Shen, Zhongrong; Ohdaira, Keisuke; Shimoda, Tatsuya [Japan Advanced Institute of Science and Technology, Nomi, Ishikawa, 923-1292 (Japan); Japan Science and Technology Agency, ALCA, Nomi, Ishikawa, 923-1211 (Japan)

    2015-08-31

    A simple, inexpensive method for fabricating a hydrogenated amorphous silicon (a-Si:H) film using thermal chemical vapor deposition from cyclopentasilane (CPS) at atmospheric pressure with a substrate temperature of 370 °C is described. The reactant gas was generated from liquid CPS by vaporization in the deposition chamber. The vaporized CPS gas was transformed immediately into a-Si:H film on a heated substrate. The a-Si:H films could be doped either n- or p-type by dissolving appropriate amounts of white phosphorus or decaborane, respectively, in the liquid CPS before vaporization. This process allows deposition of doped a-Si:H films of photovoltaic device-quality without the need for handling, storage, or transportation of large amounts of gaseous reactants. - Highlights: • B and P doped a-Si:H films made from liquid materials is presented. • Decaborane and white phosphorus is dissolved in the liquid materials. • A simple, inexpensive method for fabricating a-Si:H films using non-vacuum process. • The doped a-Si:H films with usable quality for photovoltaic devices are deposited.

  13. Nano-Impact (Fatigue Characterization of As-Deposited Amorphous Nitinol Thin Film

    Directory of Open Access Journals (Sweden)

    Rehan Ahmed

    2012-08-01

    Full Text Available This paper presents nano-impact (low cycle fatigue behavior of as-deposited amorphous nitinol (TiNi thin film deposited on Si wafer. The nitinol film was 3.5 µm thick and was deposited by the sputtering process. Nano-impact tests were conducted to comprehend the localized fatigue performance and failure modes of thin film using a calibrated nano-indenter NanoTest™, equipped with standard diamond Berkovich and conical indenter in the load range of 0.5 mN to 100 mN. Each nano-impact test was conducted for a total of 1000 fatigue cycles. Depth sensing approach was adapted to understand the mechanisms of film failure. Based on the depth-time data and surface observations of films using atomic force microscope, it is concluded that the shape of the indenter test probe is critical in inducing the localized indentation stress and film failure. The measurement technique proposed in this paper can be used to optimize the design of nitinol thin films.

  14. Drain bias effect on the instability of amorphous indium gallium zinc oxide thin film transistor

    International Nuclear Information System (INIS)

    We fabricated amorphous indium gallium zinc oxide thin film transistors (TFTs) in a top gate structure on a glass substrate. We investigated the effect of drain bias on the instability of the device. Although the device showed highly stable characteristics under both positive and negative gate bias stress, it showed significant degradation in the transfer characteristics under drain bias stress. The degradation phenomena are somewhat similar to those of negative gate bias illumination stress (NBIS). In the case of NBIS, degradation mechanisms have been confused between two kinds of illustrations, one of which is hole trapping in the gate insulator and the other is an increase of electron density in the active layer. Our experimental results revealed that the degradation mechanism of drain bias stress is closer to the latter mechanism of NBIS in amorphous oxide TFTs. - Highlights: ► Drain bias also degrades amorphous oxide thin film transistors. ► Increase of electron density near the drain junction occurs under drain bias stress. ► Oxygen vacancies can be ionized through the impingement of fast electrons

  15. Stepwise morphological change of porous amorphous ice films observed through adsorption of methane

    Science.gov (United States)

    Horimoto, Noriko; Kato, Hiroyuki S.; Kawai, Maki

    2002-03-01

    Morphological change of amorphous ice films of D2O has been studied through adsorption of methane using thermal desorption spectroscopy (TDS) and infrared reflection absorption spectroscopy under ultrahigh vacuum. The investigated ice films were prepared under several different conditions; first, water (D2O) molecules are evaporated onto a Ru substrate at 25 K, and then subjected to an annealing process at various temperatures prior to methane deposition. On ice annealed at low temperatures, two desorption species of methane were observed in TDS: one was derived from methane adsorbed near the ice surface and the other was attributed to the desorption of methane encapsulated in ice during heating. Only the former species was observed when the annealing temperature exceeded 60 K. This indicates that reconstruction of ice occurs below 60 K, which inhibits the encapsulation of methane molecules from the amorphous ice. On the other hand, infrared spectra of ice covered with methane show that the micropores in ice start to collapse at ˜80 K, and ice becomes pore free at 120 K. We have found that the morphological change of amorphous ice induced by thermal relaxation takes place in a stepwise manner.

  16. Scaling of anomalous hall effect in amorphous CoFeB Films with accompanying quantum correction

    KAUST Repository

    Zhang, Yan

    2015-05-08

    Scaling of anomalous Hall effect in amorphous CoFeB films with thickness ranging from 2 to 160 nm have been investigated. We have found that the scaling relationship between longitudinal (ρxx) and anomalous Hall (ρAH) resistivity is distinctly different in the Bloch and localization regions. For ultrathin CoFeB films, the sheet resistance (Rxx) and anomalous Hall conductance (GAH) received quantum correction from electron localization showing two different scaling relationships at different temperature regions. In contrast, the thicker films show a metallic conductance, which have only one scaling relationship in the entire temperature range. Furthermore, in the dirty regime of localization regions, an unconventional scaling relationship View the MathML sourceσAH∝σxxα with α=1.99 is found, rather than α=1.60 predicted by the unified theory.

  17. Quantitative assessment of molecular dynamics-grown amorphous silicon and germanium films on silicon (111)

    Science.gov (United States)

    Käshammer, Peter; Borgardt, Nikolai I.; Seibt, Michael; Sinno, Talid

    2016-09-01

    Molecular dynamics based on the empirical Tersoff potential was used to simulate the deposition of amorphous silicon and germanium on silicon(111) at various deposition rates and temperatures. The resulting films were analyzed quantitatively by comparing one-dimensional atomic density profiles to experimental measurements. It is found that the simulations are able to capture well the structural features of the deposited films, which exhibit a gradual loss of crystalline order over several monolayers. A simple mechanistic model is used to demonstrate that the simulation temperature may be used to effectively accelerate the surface relaxation processes during deposition, leading to films that are consistent with experimental samples grown at deposition rates many orders-of-magnitude slower than possible in a molecular dynamics simulation.

  18. Optical Modulation of the Diffraction Efficiency in an Indoline Azobenzene/Amorphous Polycarbonate Film.

    Science.gov (United States)

    Williams, G V M; Do, My T T; Middleton, A; Raymond, S G; Bhuiyan, M D H; Kay, A J

    2016-12-01

    We have made a diffraction grating in an indoline azobenzene/amorphous polycarbonate film by two-beam interference at 532 nm that periodically photodegrades the indoline azobenzene dye. Subsequent illumination of the film with 532-nm light into the trans-isomer band leads to trans-cis isomerization in the indoline azobenzene dye and results in a decrease in the trans-isomer band absorption coefficient. This causes the diffraction efficiency to decrease when probed at 655 nm. The diffraction efficiency returns to its original value when the 532-nm light is blocked by thermal relaxation from the indoline azobenzene cis-isomer to the trans-isomer. Thus, we have been able to optically modulate the diffraction efficiency in a thin film diffraction grating. PMID:27416904

  19. Composition-Controlled Low Field Magnetostriction of TbFe Amorphous Films

    Institute of Scientific and Technical Information of China (English)

    JIANG Hong-Chuan; ZHANG Wan-Li; ZHANG Wen-Xu; PENG Bin

    2008-01-01

    @@ Amorphous TbFe films are fabricated by dc magnetron sputtering, and their magnetostrictions at low field are examined over a wide range of terbium content (from 32at.% to 70at.%). It is found that the terbium content plays an important role in the magnetic and magnetostrictive properties of TbFe films. TbFe film soft magnetic properties and low field magnetostriction can be efficiently improved by controlling the terbium at an optimum content. The magnetostriction at lower magnetic field is increased with the increase of terbium content up to 48.2at.%. After reaching the maximum value, further increase of terbium content would result in a great decrease of the low field magnetostriction. By contrast, at higher magnetic field, the magnetostriction is decreased monotonically with the increase of the terbium content.

  20. Photonic bandgap amorphous chalcogenide thin films with multilayered structure grown by pulsed laser deposition method

    Science.gov (United States)

    Zhang, Shao-qian; Němec, Petre; Nazabal, Virginie; Jin, Yu-qi

    2016-05-01

    Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge25Ga5Sb10S65 (doped with Er3+) spacer layer surrounded by two 5-layer As40Se60/Ge25Sb5S70 reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality.

  1. Corrosion behavior of amorphous/nanocrystalline Al-Cr-Fe film deposited by double glow plasmas technique

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    In order to improve the corrosion resistance of AZ31 magnesium alloy,the amorphous/nanocrystal Al-Cr-Fe film has been successfully prepared on AZ31 magnesium alloy by double glow plasma tech-nology.The amorphous/nanocrystalline consists of two different regions,i.e.,an amorphous layer on outmost surface and an underlying lamellar nanocrystalline layer with a grain size of less than 10 nm.The corrosion behavior of amorphous/nanocrystalline Al-Cr-Fe film in 3.5% NaCl solution is investi-gated using an electrochemical polarization measurement.Compared with the AZ31 magnesium alloy,the amorphous/nanocrystalline Al-Cr-Fe film exhibits more positive corrosion potentials and lower corrosion current densities than that of AZ31 magnesium alloy.XPS measurement reveals that the passive film formed on the Al-Cr-Fe film after the anodic polarization tests is strongly enriched in Cr2O3,Fe2O3 and Al2O3 at outer surface of the film and in the inner layer consists of Cr2O3,FeO and Al2O3.

  2. Energy loss of electrons impinging upon glassy carbon, amorphous carbon, and diamond: Comparison between two different dispersion laws

    International Nuclear Information System (INIS)

    In this paper, we compare and discuss calculated inelastic mean free path, stopping power, range, and reflection electron energy loss spectra obtained using two different and popular dispersion laws. We will present and discuss the results we obtained investigating the interaction of electron beams impinging upon three allotropic forms of carbon, i.e. solid glassy carbon, amorphous carbon, and diamond. We will compare numerical results with experimental reflection electron energy loss spectra

  3. Amorphous thin films for solar cell application. Final technical report, March 15, 1979-February 29, 1980

    Energy Technology Data Exchange (ETDEWEB)

    Jonath, A D; Anderson, W W; Crowley, J L; MacMillan, H F; Junga, F A; Knudsen, J F; Monahan, K M; Thornton, J A

    1980-03-01

    Magnetron sputtering, a deposition method in which magnetic confinement of a plasma encourages high deposition rates at low working gas partial pressures, is under investigation in this program as a candidate production technology for large-scale manufacture of high-efficiency, thin-film amorphous silicon solar photovoltaic cells. The approach uses two dc magnetron geometries: (1) a low-cost planar magnetron (PM) system for exploratory and detailed examination of deposition parameter space; and (2) a cylindrical magnetron (CM) system, scalable to production sizes, for deposition of homogeneous films over large areas. Detailed descriptions of these two systems are included. During this first-year effort, amorphous silicon films and device structures were sputtered in both PM and CM systems under a wide range of deposition conditions (i.e., T/sub s/, P/sub Ar/, P/sub H/sub 2//) using both doped and undoped sputter targets. Measured electrical and optical film properties indicate that control over a wide range of conductivity, photoconductivity, conductivity activation energy, and optical and infrared absorption behavior is achievable. Multiple depositions to fabricate simple MIS device structures and simultaneously to deposit monitor samples of individual constituent layers have been successful. Other program highlights are: (1) deposition rates as great as 1500 A/min were achieved in high-power dc magnetron operation at practical substrate-target spacings; (2) p-type and n-type a-Si:H consistently deposited from p- and n-type targets, respectively; (3) demonstrated correlation of argon and hydrogen partial pressure variations with optical, electronic, and structural properties of magnetron-sputtered a-Si:H films; and (4) initial depositions have achieved properties comparable to those in films made by rf sputtering and glow-discharge methods.

  4. Structural and Physical Property Studies of Amorphous Zn-In-Sn-O Thin Films

    Energy Technology Data Exchange (ETDEWEB)

    Proffit, Diana E; Ma, Qing; Buchholz, Donald B; Chang, Robert P.H.; Bedzyk, Michael J; Mason, Thomas O [NWU

    2013-03-07

    The structures in amorphous (a-) Zn, Sn co-doped In2O3 (ZITO) thin films grown by pulsed laser deposition on glass under varying oxygen pressure or with varying Sn:Zn ratios were determined using X-ray absorption spectroscopy and anomalous X-ray scattering. Typical structures around cations in a-ZITO films are described and compared with crystalline (c-) ZITO films. The results show that the Zn cations are fourfold coordinated with Zn–O bond lengths of 1.98 ± 0.02 Å, which is close to that in bulk ZnO. As a consequence, the second coordination shells around Zn contract. At longer distances away from Zn, the structure is commensurate with the averaged structure. The unit volume around In also contracts slightly compared to bulk In2O3, whereas the Sn–O bond length is similar to the one in bulk SnO2. These unique structural characteristics may account for the films' superior thermal stability over amorphous Sn-doped In2O3, and suggest that Zn and Sn act as network-forming cations. Like in c-ZITO, coordination numbers (N) around Sn, In, and Zn follow the order NSn > NIn > NZn. Unlike in c-ZITO, where electrical properties change significantly with a slight variation in the Sn:Zn ratio, this variation does not markedly alter the electrical properties, or the local structures, of a-ZITO films. Dramatic changes in the electrical properties occur for films grown under various oxygen pressures, which point to oxygen “defects” as the source of charge carriers.

  5. Amorphization and recrystallization processes in monocrystalline beta silicon carbide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Edmond, J.A.; Withrow, S.P.; Kong, H.S.; Davis, R.F.

    1985-01-01

    Individual, as well as multiple doses of /sup 27/Al/sup +/, /sup 31/P/sup +/, /sup 28/Si/sup +/, and /sup 28/Si/sup +/ and /sup 12/C/sup +/, were implanted into (100) oriented monocrystalline ..beta..-SiC films. The critical energy of approx. =16 eV/atom required for the amorphization of ..beta..-SiC via implantation of /sup 27/Al/sup +/ and /sup 31/P/sup +/ was determined using the TRIM84 computer program for calculation of the damage-energy profiles coupled with the results of RBS/ion channeling analyses. In order to recrystallize amorphized layers created by the individual implantation of all four ion species, thermal annealing at 1600, 1700, or 1800/sup 0/C was employed. Characterization of the recrystallized layers was performed using XTEM. Examples of SPE regrown layers containing precipitates and dislocation loops, highly faulted-microtwinned regions, and random crystallites were observed.

  6. Modeling the Crystallization of Amorphous Silicon Thin Films Using a High Repetition Rate Scanning Laser

    Directory of Open Access Journals (Sweden)

    R. Černý

    2000-01-01

    Full Text Available An optimum design of experimental setup for the preparation of polycrystalline silicon (pc-Si films from amorphous layers applicable in the solar cell production is analyzed in the paper. In the computational simulations, the influence of basic characteristic parameters of the experimental procedure on the mechanisms of pc-Si lateral growth is studied. Among these parameters, the energy density of the applied laser and the thickness of the amorphous silicon (a-Si layer are identified as the most significant. As an optimum solution, the mechanism of pc-Si growth consisting in repeated melting of a part of already crystallized pc-Si layer by the scanning laser is proposed.

  7. Highly efficient ultrathin-film amorphous silicon solar cells on top of imprinted periodic nanodot arrays

    Energy Technology Data Exchange (ETDEWEB)

    Yan, Wensheng, E-mail: yws118@gmail.com; Gu, Min, E-mail: mgu@swin.edu.au [Centre for Micro-Photonics, Faculty of Science, Engineering and Technology, Swinburne University of Technology, Hawthorn, Victoria 3122 (Australia); Tao, Zhikuo [College of Electronic Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023 (China); Ong, Thiam Min Brian [Plasma Sources and Application Center, NIE, Nanyang Technological University, 1 Nanyang Walk, Singapore 637616 (Singapore); Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602 (Singapore)

    2015-03-02

    The addressing of the light absorption and conversion efficiency is critical to the ultrathin-film hydrogenated amorphous silicon (a-Si:H) solar cells. We systematically investigate ultrathin a-Si:H solar cells with a 100 nm absorber on top of imprinted hexagonal nanodot arrays. Experimental evidences are demonstrated for not only notable silver nanodot arrays but also lower-cost ITO and Al:ZnO nanodot arrays. The measured external quantum efficiency is explained by the simulation results. The J{sub sc} values are 12.1, 13.0, and 14.3 mA/cm{sup 2} and efficiencies are 6.6%, 7.5%, and 8.3% for ITO, Al:ZnO, and silver nanodot arrays, respectively. Simulated optical absorption distribution shows high light trapping within amorphous silicon layer.

  8. The Urbach focus and optical properties of amorphous hydrogenated SiC thin films

    Science.gov (United States)

    Guerra, J. A.; Angulo, J. R.; Gomez, S.; Llamoza, J.; Montañez, L. M.; Tejada, A.; Töfflinger, J. A.; Winnacker, A.; Weingärtner, R.

    2016-05-01

    We report on the optical bandgap engineering of sputtered hydrogenated amorphous silicon carbide (a-SiC:H) thin films under different hydrogen dilution conditions during the deposition process and after post-deposition annealing treatments. The Tauc-gap and Urbach energy are calculated from ultraviolet-visible optical transmittance measurements. Additionally, the effect of the thermal annealing temperature on the hydrogen out-diffusion is assessed through infra-red absorption spectroscopy. A new model for the optical absorption of amorphous semiconductors is presented and employed to determine the bandgap as well as the Urbach energy from a single fit of the absorption coefficient. This model allowed the discrimination of the Urbach tail from the Tauc region without any external bias. Finally, the effect of the hydrogen dilution on the band-edge and the Urbach focus is discussed.

  9. A delta-doped amorphous silicon thin-film transistor with high mobility and stability

    International Nuclear Information System (INIS)

    Ultrathin doped layers, known as delta-doped layers, were introduced within the intrinsic amorphous silicon (a-Si) active layer to fabricate hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) with enhanced field-effect mobility. The performance of the delta-doped a-Si:H TFTs depended on the phosphine (PH3) flow rate and the distance from the n+ a-Si to the delta-doping layer. The delta-doped a-Si:H TFTs fabricated using a commercial manufacturing process exhibited an enhanced field-effect mobility of approximately ∼0.23 cm2/Vs (compared to a conventional a-Si:H TFT with 0.15 cm2/Vs) and a desirable stability under a bias-temperature stress test.

  10. Reduction of Photoluminescence Quenching by Deuteration of Ytterbium-Doped Amorphous Carbon-Based Photonic Materials

    Directory of Open Access Journals (Sweden)

    Hui-Lin Hsu

    2014-08-01

    Full Text Available In situ Yb-doped amorphous carbon thin films were grown on Si substrates at low temperatures (<200 °C by a simple one-step RF-PEMOCVD system as a potential photonic material for direct integration with Si CMOS back end-of-line processing. Room temperature photoluminescence around 1 µm was observed via direct incorporation of optically active Yb3+ ions from the selected Yb(fod3 metal-organic compound. The partially fluorinated Yb(fod3 compound assists the suppression of photoluminescence quenching by substitution of C–H with C–F bonds. A four-fold enhancement of Yb photoluminescence was demonstrated via deuteration of the a-C host. The substrate temperature greatly influences the relative deposition rate of the plasma dissociated metal-organic species, and hence the concentration of the various elements. Yb and F incorporation are promoted at lower substrate temperatures, and suppressed at higher substrate temperatures. O concentration is slightly elevated at higher substrate temperatures. Photoluminescence was limited by the concentration of Yb within the film, the concentration of Yb ions in the +3 state, and the relative amount of quenching due to the various de-excitation pathways associated with the vibrational modes of the host a-C network. The observed wide full-width-at-half-maximum photoluminescence signal is a result of the variety of local bonding environments due to the a-C matrix, and the bonding of the Yb3+ ions to O and/or F ions as observed in the X-ray photoelectron spectroscopy analyses.

  11. Piezoresistive Sensors Based on Carbon Nanotube Films

    Institute of Scientific and Technical Information of China (English)

    L(U) Jian-wei; WANG Wan-lu; LIAO Ke-jun; WANG Yong-tian; LIU CHang-lin; Zeng Qing-gao

    2005-01-01

    Piezoresistive effect of carbon nanotube films was investigated by a three-point bending test.Carbon nanotubes were synthesized by hot filament chemical vapor deposition.The experimental results showed that the carbon nanotubes have a striking piezoresistive effect.The relative resistance was changed from 0 to 10.5×10-2 and 3.25×10-2 for doped and undoped films respectively at room temperature when the microstrain under stress from 0 to 500. The gauge factors for doped and undoped carbon nanotube films under 500 microstrain were about 220 and 67 at room temperature, respectively, exceeding that of polycrystalline silicon (30) at 35℃.The origin of the resistance changes in the films may be attributed to a strain-induced change in the band gap for the doped tubes and the defects for the undoped tubes.

  12. Preparation of composite electroheat carbon film

    Institute of Scientific and Technical Information of China (English)

    XIA Jin-tong; TU Chuan-jun; LI Yan; HU Li-min; DENG Jiu-hua

    2005-01-01

    A kind of conductive and heating unit, which can reach a high surface electroheat temperature at a low voltage, was developed in view of the traditional electroheat coating which has a low surface electroheat temperature and an insufficient heat resistance of its binder. The coating molded electroheat carbon film(CMECF) was prepared by carbonizing the coating which was prepared by adding modified resin into flake graphite and carbon fiber, coating molded onto the surface of the heat resisting matrix after dried, while the hot pressing molded electroheat thick carbon film(HPMETCF) was prepared by carbonizing the bodies whose powders were hot pressing molded directly.The surface and inner microstructure of the carbon film was characterized and analyzed by SEM and DSC/TG, while electroheat property was tested by voltage-current volume resistivity tester and electrical parameter tester. The results show that, close-packed carbon network configuration is formed within the composite electroheat carbon film film after anti-oxidizable treatment reaches a higher surface electroheat temperature than that of the existing electroheat coatings at a low voltage, and has excellent electroheat property, high thermal efficiency as well as stable physicochemical property. It is found that, at room temperature(19± 2 ℃) and 22 V for 5 min, the surface electroheat temperature of the self-produced CMECF (mfiller/mresin = 1. 8/1) reaches 112 ℃ while HPMETCF (mfiller/mresin = 3. 6/1) reaches 265 ℃.

  13. Growth characteristics of amorphous-layer-free nanocrystalline silicon films fabricated by very high frequency PECVD at 250 ℃

    Institute of Scientific and Technical Information of China (English)

    Guo Yan-Qing; Huang Rui; Song Jie; Wang Xiang; Song Chao; Zhang Yi-Xiong

    2012-01-01

    Amorphous-layer-free nanocrystalline silicon films were prepared by a very high frequency plasma enhanced chemical vapor deposition (PECVD) technique using hydrogen-diluted SiH4 at 250 ℃.The dependence of the crystallinity of the film on the hydrogen dilution ratio and the film thickness was investigated.Raman spectra show that the thickness of the initial amorphous incubation layer on silicon oxide gradually decreases with increasing hydrogen dilution ratio.High-resolution transmission electron microscopy reveals that the initial amorphous incubation layer can be completely eliminated at a hydrogen dilution ratio of 98%,which is lower than that needed for the growth of amorphous-layer-free nanocrystalline silicon using an excitation frequency of 13.56 MHz.More studies on the microstructure evolution of the initial amorphous incubation layer with hydrogen dilution ratios were performed using Fourier-transform infrared spectroscopy.It is suggested that the high hydrogen dilution,as well as the higher plasma excitation frequency,plays an important role in the formation of amorphous-layer-free nanocrystalline silicon films.

  14. Adjustable optical response of amorphous silicon nanowires integrated with thin films.

    Science.gov (United States)

    Dhindsa, Navneet; Walia, Jaspreet; Pathirane, Minoli; Khodadad, Iman; Wong, William S; Saini, Simarjeet Singh

    2016-04-01

    We experimentally demonstrate a new optical platform by integrating hydrogenated amorphous silicon nanowire arrays with thin films deposited on transparent substrates like glass. A 535 nm thick thin film is anisotropically etched to fabricate vertical nanowire arrays of 100 nm diameter arranged in a square lattice. Adjusting the nanowire length, and consequently the thin film thickness permits the optical properties of this configuration to be tuned for either transmission filter response or enhanced broadband absorption. Vivid structural colors are also achieved in reflection and transmission. The optical properties of the platform are investigated for three different etch depths. Transmission filter response is achieved for a configuration with nanowires on glass without any thin film. Alternatively, integrating thin film with nanowires increases the absorption efficiency by ∼97% compared to the thin film starting layer and by ∼78% over nanowires on glass. The ability to tune the optical response of this material in this fashion makes it a promising platform for high performance photovoltaics, photodetectors and sensors. PMID:26906427

  15. Biaxial CdTe/CaF{sub 2} films growth on amorphous surface

    Energy Technology Data Exchange (ETDEWEB)

    Yuan, W., E-mail: yuanw@rpi.ed [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Tang, F.; Li, H.-F.; Parker, T. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); LiCausi, N. [Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Lu, T.-M. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Bhat, I. [Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Wang, G.-C. [Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, 110, 8th St., Troy, NY 12180 (United States); Lee, S. [US Army Armament Research, Development and Engineering Center, Benet Labs, Watervliet, NY 12189 (United States)

    2009-10-30

    A continuous and highly biaxially textured CdTe film was grown by metal organic chemical vapor deposition on an amorphous substrate using biaxial CaF{sub 2} nanorods as a buffer layer. The interface between the CdTe film and CaF{sub 2} nanorods and the morphology of the CdTe film were studied by transmission electron microscopy (TEM) and scanning electron microscopy. Both the TEM and X-ray pole figure analysis clearly reveal that the crystalline orientation of the continuous CdTe film followed the {l_brace}111{r_brace}<121> biaxial texture of the CaF{sub 2} nanorods. A high density of twin faults was observed in the CdTe film. Furthermore, the near surface texture of the CdTe thin film was investigated by reflection high-energy electron diffraction (RHEED) and RHEED surface pole figure analysis. Twinning was also observed from the RHEED surface pole figure analysis.

  16. Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced CVD

    Institute of Scientific and Technical Information of China (English)

    GUO Yu; ZHANG Xiwen; HAN Gaorong

    2007-01-01

    Hydrogenated amorphous silicon (a-Si:H) films were deposited on Si (100) and glass substrates by dielectric barrier discharge enhanced chemical vapour deposition (DBD-CVD)in (SiH4+H2) atmosphere at room temperature.Results of the thickness measurement,SEM (scanning electron microscope),Raman,and FTIR (Fourier transform infrared spectroscopy) show that with the increase in the applied peak voltage,the deposition rate and network order of the films increase,and the hydrogen bonding configurations mainly in di-hydrogen (Si-H2) and poly hydrogen (SiH2)n are introduced into the films.The UV-visible transmission spectra show that with the decrease in Sill4/ (SiH4+H2) the thin films'band gap shifts from 1.92 eV to 2.17 eV.These experimental results are in agreement with the theoretic analysis of the DBD discharge.The deposition of a-Si:H films by the DBD-CVD method as reported here for the first time is attractive because it allows fast deposition of a-Si:H films on large-area low-melting-point substrates and requires only a low cost of production without additional heating or pumping equipment.

  17. Dehydration and crystallization of amorphous calcium carbonate in solution and in air.

    Science.gov (United States)

    Ihli, Johannes; Wong, Wai Ching; Noel, Elizabeth H; Kim, Yi-Yeoun; Kulak, Alexander N; Christenson, Hugo K; Duer, Melinda J; Meldrum, Fiona C

    2014-01-01

    The mechanisms by which amorphous intermediates transform into crystalline materials are poorly understood. Currently, attracting enormous interest is the crystallization of amorphous calcium carbonate, a key intermediary in synthetic, biological and environmental systems. Here we attempt to unify many contrasting and apparently contradictory studies by investigating this process in detail. We show that amorphous calcium carbonate can dehydrate before crystallizing, both in solution and in air, while thermal analyses and solid-state nuclear magnetic resonance measurements reveal that its water is present in distinct environments. Loss of the final water fraction--comprising less than 15% of the total--then triggers crystallization. The high activation energy of this step suggests that it occurs by partial dissolution/recrystallization, mediated by surface water, and the majority of the particle then crystallizes by a solid-state transformation. Such mechanisms are likely to be widespread in solid-state reactions and their characterization will facilitate greater control over these processes.

  18. Surface structure and optical property of amorphous carbon nanotubes hybridized with cadmium selenide quantum dots

    Energy Technology Data Exchange (ETDEWEB)

    Tan, Kim Han, E-mail: kimhan8419@gmail.com; Johan, Mohd Rafie [University of Malaya, Nanomaterials Engineering Research Group, Advanced Materials Research Laboratory, Department of Mechanical Engineering (Malaysia)

    2013-09-15

    Amorphous carbon nanotubes ({alpha}-CNTs) were synthesized by a chemical reaction between ferrocene and ammonium chloride at low temperature. The as-synthesized {alpha}-CNTs were then hybridized with cadmium selenide quantum dots (CdSe QDs) through a simple chemical process. Raman spectra reveal the amorphous nature of the {alpha}-CNTs surface. X-ray diffraction pattern confirmed the amorphous phase of carbon and the formation of CdSe QDs crystalline phase. Field emission scanning electron microscopy and transmission electron microscopy (TEM and HRTEM) indicate that the successfully formed hybridized {alpha}-CNTs-CdSe QDs possess an average outer diameter in the range of 110-130 nm. The CdSe QDs fall in the size range of 15-40 nm. UV-visible spectroscopy showed quantum confinement effect due to the attachment of CdSe QDs on the surface of {alpha}-CNTs.

  19. Strong Metal-Support Interaction: Growth of Individual Carbon Nanofibers from Amorphous Carbon Interacting with an Electron Beam

    DEFF Research Database (Denmark)

    Zhang, Wei; Kuhn, Luise Theil

    2013-01-01

    The article discusses the growth behavior of carbon nanofibers (CNFs). It mentions that CNFs can be synthesized using methods such as arc-discharge, laser ablation and chemical vapor deposition. It further states that CNFs can be grown from a physical mixing of amorphous carbon and CGO/Ni nanopar......The article discusses the growth behavior of carbon nanofibers (CNFs). It mentions that CNFs can be synthesized using methods such as arc-discharge, laser ablation and chemical vapor deposition. It further states that CNFs can be grown from a physical mixing of amorphous carbon and CGO....../Ni nanoparticles, devoid of any gaseous carbon source and external heating and stimulated by an electron beam in a 300 kilo volt transmission electron microscope....

  20. Tribological behavior and film formation mechanisms of carbon nanopearls

    Science.gov (United States)

    Hunter, Chad Nicholas

    Carbon nanopearls (CNPs) are amorphous carbon spheres that contain concentrically-oriented nanometer-sized graphitic flakes. Because of their spherical shape, size (˜150 nm), and structure consisting of concentrically oriented nano-sized sp2 flakes, CNPs are of interest for tribological applications, in particular for use in solid lubricant coatings. These studies were focused on investigating mechanisms of CNP lubrication, development of methods to deposit CNP onto substrates, synthesizing CNP-gold hybrid films using Matrix Assisted Pulsed Laser Evaporation (MAPLE) and magnetron sputtering, and studying plasmas and other species present during film deposition using an Electrostatic Quadrupole Plasma (EQP) analyzer. CNPs deposited onto silicon using drop casting with methanol showed good lubricating properties in sliding contacts under dry conditions, where a transfer film was created in which morphology changed from nano-sized spheres to micron-sized agglomerates consisting of many highly deformed CNPs in which the nano-sized graphene flakes are sheared from the wrapped layer structure of the CNPs. The morphology of carbon nanopearl films deposited using a MAPLE system equipped with a 248 nm KrF excimer laser source was found to be influenced by multiple factors, including composition of the matrix solvent, laser energy and repetition rate, background pressure, and substrate temperature. The best parameters for depositing CNP films that are disperse, droplet-free and have the maximum amount of material deposited are as follows: toluene matrix, 700 mJ, 1 Hz, 100°C substrate temperature, and unregulated vacuum pressure. During depositions using MAPLE and sputtering in argon, electron ionization of toluene vapor generated from the MAPLE target and charge exchange reactions between toluene vapor and the argon plasma generated by the magnetron caused carbon to be deposited onto the gold sputter target. Thin films deposited under these conditions contained high

  1. Maximum probing depth of low-energy photoelectrons in an amorphous organic semiconductor film

    Energy Technology Data Exchange (ETDEWEB)

    Ozawa, Yusuke [Graduate School of Advanced Integration Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Nakayama, Yasuo, E-mail: nkym@restaff.chiba-u.jp [Graduate School of Advanced Integration Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Machida, Shin’ichi; Kinjo, Hiroumi [Graduate School of Advanced Integration Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Ishii, Hisao [Graduate School of Advanced Integration Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Center for Frontier Science, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan)

    2014-12-15

    Highlights: • Photoelectron attenuation lengths (AL) through amorphous organic films were examined. • In the energy range below 9 eV, AL fluctuates unlike a prediction by universal curve. • AL of photoelectron yield spectroscopy (PYS) measurements was found to be ∼3.6 nm. • PYS signals still survived through an 18 nm-thick film despite such a moderate AL. • This indicates buried interfaces in practical organic devices can be accessed by PYS. - Abstract: The attenuation length (AL) of low energy photoelectrons inside a thin film of a π-conjugated organic semiconductor material, 2,2′,2″-(1,3,5-benzinetriyl)-tris(1-phenyl-1-H-benzimidazole), was investigated using ultraviolet photoelectron spectroscopy (UPS) and photoelectron yield spectroscopy (PYS) to discuss their probing depth in amorphous organic thin films. The present UPS results indicated that the AL is 2–3 nm in the electron energy range of 6.3–8.3 eV with respect to the Fermi level, while the PYS measurements which collected the excited electrons in a range of 4.5–6 eV exhibited a longer AL of 3.6 nm. Despite this still short AL in comparison to a typical thickness range of electronic devices that are a few tens of nm-thick, the photoemission signal penetrating through further thicker (18 nm) organic film was successfully detected by PYS. This fact suggests that the electronic structures of “buried interfaces” inside practical organic devices are accessible using this rather simple measurement technique.

  2. Electrochemical Tuning of Amorphous Carbon Amount and Surface Oxidation Degree of Graphitic Quantum Dots.

    Science.gov (United States)

    Wang, Jun; Li, Yan; Zhang, Bo-Ping; Ma, Ning; Ge, Juan; Li, Ling; Li, Ting; Liu, Qian-Qian

    2016-04-01

    Graphitic quantum dots (GQDs) have attracted much interesting of researchers because of its amazing optical properties and its ability to be used for many applications. Now, there are various methods have been reported for preparation of GQDs. Among them electrochemical method is simple technology, while it can afford various conditions to realize controllable prepared of GQDs. In this study, we tuned the PH values of electrolyte to probe the relationship of electrolyte environment and GQDs' optical properties as well as to seek the effective controllable condition for GQDs' preparation. It is found that the density of oxygen-related functional groups and the amount of amorphous carbon of GQDs were related to the PH values of electrolyte. The amount of amorphous carbon decreased as the PH values increased in the region of 6.6 to 7.1. Although, the positions of photoluminescence (PL) peak almost no changed of GQDs with different density of oxygen-related functional groups, GQDs with the lowest amount of amorphous carbon achieved the maximum PL intensity. Therefore, controlling amorphous carbon's amount by electrochemical method may afford a new direction to improve the fluorescence (FL) emission of GQDs. PMID:27451661

  3. Citrate effects on amorphous calcium carbonate (ACC) structure, stability, and crystallization

    DEFF Research Database (Denmark)

    Tobler, Dominique Jeanette; Rodriguez Blanco, Juan Diego; Dideriksen, Knud;

    2015-01-01

    Understanding the role of citrate in the crystallization kinetics of amorphous calcium carbonate (ACC) is essential to explain the formation mechanisms, stabilities, surface properties, and morphologies of CaCO3 biominerals. It also contributes to deeper insight into fluid-mineral inte...

  4. A solvothermal method for synthesizing monolayer protected amorphous calcium carbonate clusters

    OpenAIRE

    Sun, Shengtong; Gebauer, Denis; Cölfen, Helmut

    2016-01-01

    A solvothermal method was developed for synthesizing organic monolayer protected amorphous calcium carbonate clusters using 10,12-pentacosadiynoic acid as ligand, ethanol as solvent and NaHCO3 decomposition as CO2 source, which can be extended to synthesize other monolayer protected mineral clusters. published

  5. Damage threshold of amorphous carbon mirror for 177 eV FEL radiation

    NARCIS (Netherlands)

    Farahani, S. D.; Chalupsky, J.; Burian, T.; Chapman, H.; Gleeson, A. J.; Hajkoya, V.; Juha, L.; Jurek, M.; Klinger, D.; Sinn, H.; Sobierajski, R.; Stormer, M.; Tiedtke, K.; Toleikis, S.; Tschentscher, T.; Wabnitz, H.; Gaudin, J.

    2011-01-01

    We present results of damage studies performed at the Free-Electron LASer in Hamburg (FLASH) on amorphous carbon (a-C). The experiment was performed in the total external reflection geometry representing the working configuration of X-ray mirrors. The 177 eV photon laser beam was focused on a 40 nm

  6. A transparent hybrid of nanocrystalline cellulose and amorphous calcium carbonate nanoparticles

    OpenAIRE

    Gebauer, Denis; Oliynyk, Vitaliy; Salajkova, Michaela; Sort, Jordi; Zhou, Qi; Bergström, Lennart; Salazar-Alvarez, German

    2011-01-01

    Nanocellulose hybrids are promising candidates for biodegradable multifunctional materials. Hybrids of nanocrystalline cellulose (NCC) and amorphous calcium carbonate (ACC) nanoparticles were obtained through a facile chemical approach over a wide range of compositions. Controlling the interactions between NCC and ACC results in hard, transparent structures with tunable composition, homogeneity and anisotropy.

  7. Analytical drain current model for amorphous IGZO thin-film transistors in abovethreshold regime

    Institute of Scientific and Technical Information of China (English)

    He Hongyu; Zheng Xueren

    2011-01-01

    An analytical drain current model is presented for amorphous In-Ga-Zn-oxide thin-film transistors in the above-threshold regime,assuming an exponential trap states density within the bandgap.Using a charge sheet approximation,the trapped and free charge expressions are calculated,then the surface potential based drain current expression is developed.Moreover,threshold voltage based drain current expressions are presented using the Taylor expansion to the surface potential based drain current expression.The calculated results of the surface potential based and threshold voltage based drain current expressions are compared with experimental data and good agreements are achieved.

  8. Analytical drain current model for amorphous IGZO thin-film transistors in above-threshold regime

    International Nuclear Information System (INIS)

    An analytical drain current model is presented for amorphous In-Ga-Zn-oxide thin-film transistors in the above-threshold regime, assuming an exponential trap states density within the bandgap. Using a charge sheet approximation, the trapped and free charge expressions are calculated, then the surface potential based drain current expression is developed. Moreover, threshold voltage based drain current expressions are presented using the Taylor expansion to the surface potential based drain current expression. The calculated results of the surface potential based and threshold voltage based drain current expressions are compared with experimental data and good agreements are achieved. (semiconductor devices)

  9. Nanostructured Diamond-Like Carbon Films Grown by Off-Axis Pulsed Laser Deposition

    Directory of Open Access Journals (Sweden)

    Seong Shan Yap

    2015-01-01

    Full Text Available Nanostructured diamond-like carbon (DLC films instead of the ultrasmooth film were obtained by pulsed laser ablation of pyrolytic graphite. Deposition was performed at room temperature in vacuum with substrates placed at off-axis position. The configuration utilized high density plasma plume arriving at low effective angle for the formation of nanostructured DLC. Nanostructures with maximum size of 50 nm were deposited as compared to the ultrasmooth DLC films obtained in a conventional deposition. The Raman spectra of the films confirmed that the films were diamond-like/amorphous in nature. Although grown at an angle, ion energy of >35 eV was obtained at the off-axis position. This was proposed to be responsible for subplantation growth of sp3 hybridized carbon. The condensation of energetic clusters and oblique angle deposition correspondingly gave rise to the formation of nanostructured DLC in this study.

  10. Molecular dynamics simulation of benzene in graphite and amorphous carbon slit pores.

    Science.gov (United States)

    Fomin, Yu D

    2013-11-15

    It is well known that confining a liquid into a pore strongly alters the liquid behavior. Investigations of the effect of confinement are of great importance for many scientific and technological applications. Here, we present a study of the behavior of benzene confined in carbon slit pores. Two types of pores are considered-graphite and amorphous carbon ones. We show that the effect of different pore structure is of crucial importance for the benzene behavior.

  11. Oxygen effect of transparent conducting amorphous Indium Zinc Tin Oxide films on Polyimide substrate for flexible electrode

    International Nuclear Information System (INIS)

    This paper discusses the effect of oxygen on the transparent conducting properties and mechanical durability of the amorphous indium zinc tin oxide (IZTO) films. IZTO films deposited on flexible clear polyimide (PI) substrate using pulsed direct current (DC) magnetron sputtering at room temperature under various oxygen partial pressures. All IZTO films deposited at room temperature exhibit an amorphous structure. The electrical and optical properties of the IZTO films were sensitively influenced by oxygen partial pressures. At optimized deposition condition of 3.0% oxygen partial pressure, the IZTO film shows the lowest resistivity of 6.4 × 10−4 Ωcm, high transmittance of over 80% in the visible range, and figure of merit value of 3.6 × 10−3 Ω−1 without any heat controls. In addition, high work function and good mechanical flexibility of amorphous IZTO films are beneficial to flexible applications. It is proven that the proper oxygen partial pressure is important parameter to enhance the transparent conducting properties of IZTO films on PI substrate deposited at room temperature. - Highlights: • Indium zinc tin oxide (IZTO) films were deposited on polyimide at room temperature. • Transparent conducting properties of IZTO were influenced with oxygen partial pressure. • The smooth surface and high work function of IZTO were beneficial to anode layer. • The mechanical reliability of IZTO shows better performance to indium tin oxide film

  12. From amorphous to microcrystalline silicon films prepared by hydrogen dilution using the VHF (70 MHz) GD technique

    OpenAIRE

    Kroll, U.; Meier, Johannes; Torres, Pedro; Pohl, J.; Shah, Arvind

    2008-01-01

    The amorphous and microcrystalline silicon films have been prepared by hydrogen dilution from pure silane to silane concentrations ≥1.25%. At silane concentrations of less than 10%, a transition from the amorphous phase to the microcrystalline phase can be observed. X-ray diffraction spectroscopy indicates a preferential growth of the crystallites in the [220] direction. Additionally, the transition into the microcrystalline regime is accompanied by a shrinking of the optical gap, a reduction...

  13. Synthesis of Ag-doped hydrogenated carbon thin films by a hybrid PVD–PECVD deposition process

    Indian Academy of Sciences (India)

    Majji Venkatesh; Sukru Taktak; Efstathios I Meletis

    2014-12-01

    Silver-doped hydrogenated amorphous carbon (Ag-DLC) films were deposited on Si substrates using a hybrid plasma vapour deposition–plasma enhanced chemical vapour deposition (PVD–PECVD) process combining Ag target magnetron sputtering and PECVD in an Ar–CH4 plasma. Processing parameters (working pressure, CH4/Ar ratio and magnetron current) were varied to obtain good deposition rate and a wide variety of Ag films. Structure and bonding environment of the films were obtained from transmission electron microscopy (TEM), energy dispersive spectroscopy (EDS) and Fourier transform infrared (FTIR) spectroscopy studies. Variation of processing parameters was found to produce Ag-doped amorphous carbon or diamond-like carbon (DLC) films with a range of characteristics with CH4/Ar ratio exercising a dominant effect. It was pointed out that Ag concentration and deposition rate of the film increased with the increase in d.c. magnetron current. At higher Ar concentration in plasma, Ag content increased whereas deposition rate of the film decreased. FTIR study showed that the films contained a significant amount of hydrogen and, as a result of an increase in the Ag content in the hydrogenated DLC film, $sp^{2}$ bond content also increased. The TEM cross sectional studies revealed that crystalline Ag particles were formed with a size in the range of 2–4 nm throughout an amorphous DLC matrix.

  14. Controllable preparation of fluorine-containing fullerene-like carbon film

    Science.gov (United States)

    Wang, Jia; Liang, Aimin; Wang, Fuguo; Xu, Longhua; Zhang, Junyan

    2016-05-01

    Fluorine-containing fullerene-like carbon (F-FLC) films were prepared by high frequency unipolar pulse plasma-enhanced chemical vapor deposition. The microstructures, mechanical properties as well as the tribological properties of the films were investigated. The results indicate that fullerene-like microstructures appear in amorphous carbon matrix and increase greatly with the increase of bias voltage from -600 to -1600 V. And the fluorine contents in F-FLC films also show a minor rise. In addition, the hardness enhances with the bias voltage and the outstanding elastic recovery maintains because of the formation of fullerene-like microstructures in the F-FLC films. Undoubtedly, the F-FLC film deposited under high bias voltage owns a superiorly low friction, which combines the merits of fluorinated carbon film and fullerene-like carbon film. Moreover, the film also shows a remarkable wear resistance, which is mainly attributed to the excellent mechanical properties. This study provides new insights for us to prepare fluorine-containing FLC films with good mechanical and tribological properties.

  15. Amorphous calcium carbonate controls avian eggshell mineralization: A new paradigm for understanding rapid eggshell calcification.

    Science.gov (United States)

    Rodríguez-Navarro, Alejandro B; Marie, Pauline; Nys, Yves; Hincke, Maxwell T; Gautron, Joel

    2015-06-01

    Avian eggshell mineralization is the fastest biogenic calcification process known in nature. How this is achieved while producing a highly crystalline material composed of large calcite columnar single crystals remains largely unknown. Here we report that eggshell mineral originates from the accumulation of flat disk-shaped amorphous calcium carbonate (ACC) particles on specific organic sites on the eggshell membrane, which are rich in proteins and sulfated proteoglycans. These structures known as mammillary cores promote the nucleation and stabilization of a amorphous calcium carbonate with calcitic short range order which predetermine the calcite composition of the mature eggshell. The amorphous nature of the precursor phase was confirmed by the diffuse scattering of X-rays and electrons. The nascent calcitic short-range order of this transient mineral phase was revealed by infrared spectroscopy and HRTEM. The ACC mineral deposited around the mammillary core sites progressively transforms directly into calcite crystals without the occurrence of any intermediate phase. Ionic speciation data suggest that the uterine fluid is equilibrated with amorphous calcium carbonate, throughout the duration of eggshell mineralization process, supporting that this mineral phase is constantly forming at the shell mineralization front. On the other hand, the transient amorphous calcium carbonate mineral deposits, as well as the calcite crystals into which they are converted, form by the ordered aggregation of nanoparticles that support the rapid mineralization of the eggshell. The results of this study alter our current understanding of avian eggshell calcification and provide new insights into the genesis and formation of calcium carbonate biominerals in vertebrates.

  16. Crystallization study of amorphous sputtered NiTi bi-layer thin film

    Energy Technology Data Exchange (ETDEWEB)

    Mohri, Maryam, E-mail: mmohri@ut.ac.ir [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany); Nili-Ahmadabadi, Mahmoud [School of Metallurgy and Materials Engineering, College of Engineering, University of Tehran, Tehran (Iran, Islamic Republic of); Center of Excellence for High Performance Materials, University of Tehran, Tehran (Iran, Islamic Republic of); Chakravadhanula, Venkata Sai Kiran [Karlsruhe Institute of Technology, Institute of Nanotechnology, 76021 Karlsruhe (Germany)

    2015-05-15

    The crystallization of Ni-rich/NiTiCu bi-layer thin film deposited by magnetron sputtering from two separate alloy targets was investigated. To achieve the shape memory effect, the NiTi thin films deposited at room temperature with amorphous structure were annealed at 773 K for 15, 30, and 60 min for crystallization. Characterization of the films was carried out by differential scanning calorimetry to indicate the crystallization temperature, grazing incidence X-ray diffraction to identify the phase structures, atomic force microscopy to evaluate surface morphology, scanning transmission electron microscopy to study the cross section of the thin films. The results show that the structure of the annealed thin films strongly depends on the temperature and time of the annealing. Crystalline grains nucleated first at the surface and then grew inward to form columnar grains. Furthermore, the crystallization behavior was markedly affected by composition variations. - Highlights: • A developed bi-layer Ni45TiCu5/Ni50.8Ti was deposited on Si substrate and crystallized. • During crystallization, The Ni{sub 45}TiCu{sub 5} layer is thermally less stable than the Ni-rich layer. • The activation energy is 302 and 464 kJ/mol for Cu-rich and Ni-rich layer in bi-layer, respectively.

  17. Morphological characteristics and optical properties of hydrogenated amorphous silicon thin films

    Science.gov (United States)

    Tang, Haihua; Liu, Shuang; Zhou, Xiang; Liu, Yunfei; Chen, Dejun; Liu, Yong; Zhong, Zhiyong

    2016-05-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were prepared by radio frequency (RF) plasma enhanced chemical vapor deposition (RF-PECVD) technique with silane (SiH4) as reactive gas. The influence of process parameters on the morphological characteristics and optical properties of a-Si:H thin films were systematically investigated. When the RF power density was taken as the only variable, it firstly improves the smoothness of the surface with increasing the RF power density below the value of 0.17 W/cm2, and then exhibits an obvious degradation at further power density. The refractive index, extinction coefficient, optical energy gap initially increase and reach a maximum at 0.17 W/cm2, followed by a significant decrease with further RF power density. When the RF power density was taken as the only variable, the surface of a-Si:H thin films become smoother by increasing the reaction pressure in the investigated range (from 50 Pa to 140 Pa), and the refractive index, extinction coefficient, optical energy gap increase with increasing of reaction pressure. The effect of RF power density and the reaction pressure on the morphological characteristics and optical properties of a-Si:H thin films was obtained, contributing to the further studies of the performance and applications of a-Si:H thin films.

  18. Effects of Atomic-Scale Structure on the Fracture Properties of Amorphous Carbon - Carbon Nanotube Composites

    Science.gov (United States)

    Jensen, Benjamin D.; Wise, Kristopher E.; Odegard, Gregory M.

    2015-01-01

    The fracture of carbon materials is a complex process, the understanding of which is critical to the development of next generation high performance materials. While quantum mechanical (QM) calculations are the most accurate way to model fracture, the fracture behavior of many carbon-based composite engineering materials, such as carbon nanotube (CNT) composites, is a multi-scale process that occurs on time and length scales beyond the practical limitations of QM methods. The Reax Force Field (ReaxFF) is capable of predicting mechanical properties involving strong deformation, bond breaking and bond formation in the classical molecular dynamics framework. This has been achieved by adding to the potential energy function a bond-order term that varies continuously with distance. The use of an empirical bond order potential, such as ReaxFF, enables the simulation of failure in molecular systems that are several orders of magnitude larger than would be possible in QM techniques. In this work, the fracture behavior of an amorphous carbon (AC) matrix reinforced with CNTs was modeled using molecular dynamics with the ReaxFF reactive forcefield. Care was taken to select the appropriate simulation parameters, which can be different from those required when using traditional fixed-bond force fields. The effect of CNT arrangement was investigated with three systems: a single-wall nanotube (SWNT) array, a multi-wall nanotube (MWNT) array, and a SWNT bundle system. For each arrangement, covalent bonds are added between the CNTs and AC, with crosslink fractions ranging from 0-25% of the interfacial CNT atoms. The SWNT and MWNT array systems represent ideal cases with evenly spaced CNTs; the SWNT bundle system represents a more realistic case because, in practice, van der Waals interactions lead to the agglomeration of CNTs into bundles. The simulation results will serve as guidance in setting experimental processing conditions to optimize the mechanical properties of CNT

  19. Electronic Power System Application of Diamond-Like Carbon Films

    Science.gov (United States)

    Wu, Richard L. C.; Kosai, H.; Fries-Carr, S.; Weimer, J.; Freeman, M.; Schwarze, G. E.

    2003-01-01

    A prototype manufacturing technology for producing high volume efficiency and high energy density diamond-like carbon (DLC) capacitors has been developed. Unique dual ion-beam deposition and web-handling systems have been designed and constructed to deposit high quality DLC films simultaneously on both sides of capacitor grade aluminum foil and aluminum-coated polymer films. An optimized process, using inductively coupled RF ion sources, has been used to synthesize electrically robust DLC films. DLC films are amorphous and highly flexible, making them suitable for the production of wound capacitors. DLC capacitors are reliable and stable over a wide range of AC frequencies from 20 Hz to 1 MHz, and over a temperature range from .500 C to 3000 C. The compact DLC capacitors offer at least a 50% decrease in weight and volume and a greater than 50% increase in temperature handling capability over equal value capacitors built with existing technologies. The DLC capacitors will be suitable for high temperature, high voltage, pulsed power and filter applications.

  20. {sup 57}Fe Moessbauer studies of Fe-Si based amorphous ferromagnetic ribbons and thin films

    Energy Technology Data Exchange (ETDEWEB)

    Aghamohammadzadeh, H

    1998-04-01

    {sup 57}Fe Moessbauer Spectroscopy has been used to study the mean magnetic moment direction and the distribution of moment directions in ribbon and thin film of amorphous ferromagnets known as Metglass and Finemet. We have studied them in As Received (AR) and Stress Relieved (SR) or Heat Treated (HT) states. These samples are excellent 'soft magnetic materials' with low coercivity of 8 A/m and 0.5 A/m respectively. Annealing has different effects on these samples. Although following annealing coercivity decreases for both Metglass and Finemet samples, in the Finemet it creates a second phase of DO{sub 3} structure which is a nanocrystallite. Our analysis also shows that in the Heat Treated Finemet ribbon 34 % (vol.) of the sample is amorphous and 64 % (vol.) nanocrystalline. In the HT Finemet there are seven different iron sites of which 6 sites belong to the crystalline phase and one site to the amorphous phase. We have studied the distribution of the hyperfine fields, which cause broadening of the spectral lines in the amorphous state. Each iron site has a different environment which is in turn the reason for the field distribution.Our results show that following annealing the mean magnetic field decreases from about 211 kOe in the AR Finemet to 165 kOe in the amorphous phase of the heat treated Finemet which means in this phase there is a depletion in the iron atoms. The spectra were recorded for a range of inclinations between the {gamma}-rays and the normal to the sample plane. Different phenomenological models have been used to investigate the moment direction distribution (anisotropy) in our sample. The results show that in both Metglass and Finemet samples annealing decreases the in-plane anisotropy substantially but not the out-of-plane anisotropy. We also show that the properties of Metglass thin film are quite different from its ribbon sample. Low temperature studies of the Metglass Ribbon sample allow us to investigate the temperature

  1. 57Fe Moessbauer studies of Fe-Si based amorphous ferromagnetic ribbons and thin films

    International Nuclear Information System (INIS)

    57Fe Moessbauer Spectroscopy has been used to study the mean magnetic moment direction and the distribution of moment directions in ribbon and thin film of amorphous ferromagnets known as Metglass and Finemet. We have studied them in As Received (AR) and Stress Relieved (SR) or Heat Treated (HT) states. These samples are excellent 'soft magnetic materials' with low coercivity of 8 A/m and 0.5 A/m respectively. Annealing has different effects on these samples. Although following annealing coercivity decreases for both Metglass and Finemet samples, in the Finemet it creates a second phase of DO3 structure which is a nanocrystallite. Our analysis also shows that in the Heat Treated Finemet ribbon 34 % (vol.) of the sample is amorphous and 64 % (vol.) nanocrystalline. In the HT Finemet there are seven different iron sites of which 6 sites belong to the crystalline phase and one site to the amorphous phase. We have studied the distribution of the hyperfine fields, which cause broadening of the spectral lines in the amorphous state. Each iron site has a different environment which is in turn the reason for the field distribution. Our results show that following annealing the mean magnetic field decreases from about 211 kOe in the AR Finemet to 165 kOe in the amorphous phase of the heat treated Finemet which means in this phase there is a depletion in the iron atoms. The spectra were recorded for a range of inclinations between the γ-rays and the normal to the sample plane. Different phenomenological models have been used to investigate the moment direction distribution (anisotropy) in our sample. The results show that in both Metglass and Finemet samples annealing decreases the in-plane anisotropy substantially but not the out-of-plane anisotropy. We also show that the properties of Metglass thin film are quite different from its ribbon sample. Low temperature studies of the Metglass Ribbon sample allow us to investigate the temperature dependence of the moment

  2. Characteristics of Disorder and Defect in Hydrogenated Amorphous Silicon Nitride Thin Films Containing Silicon Nanograins

    Institute of Scientific and Technical Information of China (English)

    DING Wen-ge; YU Wei; ZHANG Jiang-yong; HAN Li; FU Guang-sheng

    2006-01-01

    The hydrogenated amorphous silicon nitride (SiNx) thin films embedded with nano-structural silicon were prepared and the microstructures at the interface of silicon nano-grains/SiNx were identified by the optical absorption and Raman scattering measurements. Characterized by the exponential tail of optical absorption and the band-width of the Raman scattering TO mode, the disorder in the interface region increases with the gas flow ratio increasing. Besides, as reflected by the sub-gap absorption coefficients, the density of interface defect states decreases, which can be attributed to the structural mismatch in the interface region and also the changes of hydrogen content in the deposited films. Additional annealing treatment results in a significant increase of defects and degree of disorder, for which the hydrogen out-diffusion in the annealing process would be responsible.

  3. Structure of amorphous silicon alloy films: Annual subcontract report, January 15, 1988--January 14, 1989

    Energy Technology Data Exchange (ETDEWEB)

    Norberg, R.E.; Fedders, P.A.

    1989-06-01

    The principal objective of this research program has been to improve the understanding at the microscopic level of amorphous silicon-germanium-alloy films deposited under various conditions to assist researchers to produce higher quality films. The method has been a joint theoretical and experimental approach to the correlation of NMR, ESR, and other characterizations, especially relating to rearrangements of hydrogen. Deuteron magnetic resonance reveals the presence of (and changes in) tightly bonded hydrogen (deuterium), weakly bonded hydrogen, molecular hydrogen, and rotating silyl groups. Microvoids are investigated via observation of para D/sub 2/ for which /Delta/M/sub J/ transitions are frozen out. Solid echoes reveal HD and ortho D/sub 2/ trapped as singles in the semiconductor matrix. Theoretical calculations show dangling bonds to be more likely than floating bonds. 23 refs., 11 figs.

  4. Domain wall energy landscapes in amorphous magnetic films with asymmetric arrays of holes

    Energy Technology Data Exchange (ETDEWEB)

    Alija, A; Perez-Junquera, A; RodrIguez-RodrIguez, G; Velez, M; Alameda, J M; MartIn, J I [Depto. Fisica, Fac. Ciencias, Universidad de Oviedo - CINN, Av. Calvo Sotelo s/n, 33007 Oviedo (Spain); Marconi, V I; Kolton, A B; Parrondo, J M R [Depto. Fisica Atomica, Molecular y Nuclear, and GISC, Universidad Complutense, 28040 Madrid (Spain); Anguita, J V [Instituto de Microelectronica de Madrid, CNM-CSIC, Isaac Newton 8, PTM, Tres Cantos, 28760 Madrid (Spain)

    2009-02-21

    Arrays of asymmetric holes have been defined in amorphous Co-Si films by e-beam lithography in order to study domain wall motion across the array subject to the asymmetric pinning potential created by the holes. Experimental results on Kerr effect magnetooptical measurements and hysteresis loops are compared with micromagnetic simulations in films with arrays of triangular holes. These show that the potential asymmetry favours forward wall propagation for flat walls but, if the wall contains a kink, net backward wall propagation is preferred at low fields, in agreement with minor loop experiments. The difference between the fields needed for forward and backward flat wall propagation increases as the size of the triangular holes is reduced, becoming maximum for 1 {mu}m triangles, which is the characteristic length scale set by domain wall width.

  5. Corrosion behavior of amorphous/nanocrystalline Al-Cr-Fe film deposited by double glow plasmas technique

    Institute of Scientific and Technical Information of China (English)

    XU Jiang; CHEN ZheYuan; TAO Jie; JIANG ShuYun; LIU ZiLi; XU Zhong

    2009-01-01

    In order to improve the corrosion resistance of AZ31 magnesium alloy, the amorphous/nanocrystal AI-Cr-Fe film has been successfully prepared on AZ31 magnesium alloy by double glow plasma tech-nology. The amorphous/nanocrystalline consists of two different regions, I.e., an amorphous layer on outmost surface and an underlying lamellar nanocrystalline layer with a grain size of less than 10 nm.The corrosion behavior of amorphouslnanocrystalline AI-Cr-Fe film in 3.5% NaCl solution is investi-gated using an electrochemical polarization measurement. Compared with the AZ31 magnesium alloy,the amorphous/nanocrystalline Al-Cr-Fe film exhibits more positive corrosion potentials and lower corrosion current densities than that of AZ31 magnesium alloy. XPS measurement reveals that the passive film formed on the AI-Cr-Fe film after the anodic polarization tests is strongly enriched in Cr2O3,Fe2O3 and Al2O3 at outer surface of the film and in the inner layer consists of Cr2O3, FeO and Al2O3.

  6. Solid solution or amorphous phase formation in TiZr-based ternary to quinternary multi-principal-element films

    Directory of Open Access Journals (Sweden)

    Mariana Braic

    2014-08-01

    The deposited films exhibited only solid solution (fcc, bcc or hcp or amorphous phases, no intermetallic components being detected. It was found that the hcp structure was stabilized by the presence of Hf or Y, bcc by Nb or Al and fcc by Cu. For the investigated films, the atomic size difference, mixing enthalpy, mixing entropy, Gibbs free energy of mixing and the electronegativity difference for solid solution and amorphous phases were calculated based on Miedema׳s approach of the regular solution model. It was shown that the atomic size difference and the ratio between the Gibbs free energies of mixing of the solid solution and amorphous phases were the most significant parameters controlling the film crystallinity.

  7. Core-shell amorphous silicon-carbon nanoparticles for high performance anodes in lithium ion batteries

    Science.gov (United States)

    Sourice, Julien; Bordes, Arnaud; Boulineau, Adrien; Alper, John P.; Franger, Sylvain; Quinsac, Axelle; Habert, Aurélie; Leconte, Yann; De Vito, Eric; Porcher, Willy; Reynaud, Cécile; Herlin-Boime, Nathalie; Haon, Cédric

    2016-10-01

    Core-shell silicon-carbon nanoparticles are attractive candidates as active material to increase the capacity of Li-ion batteries while mitigating the detrimental effects of volume expansion upon lithiation. However crystalline silicon suffers from amorphization upon the first charge/discharge cycle and improved stability is expected in starting with amorphous silicon. Here we report the synthesis, in a single-step process, of amorphous silicon nanoparticles coated with a carbon shell (a-Si@C), via a two-stage laser pyrolysis where decomposition of silane and ethylene are conducted in two successive reaction zones. Control of experimental conditions mitigates silicon core crystallization as well as formation of silicon carbide. Auger electron spectroscopy and scanning transmission electron microscopy show a carbon shell about 1 nm in thickness, which prevents detrimental oxidation of the a-Si cores. Cyclic voltammetry demonstrates that the core-shell composite reaches its maximal lithiation during the first sweep, thanks to its amorphous core. After 500 charge/discharge cycles, it retains a capacity of 1250 mAh.g-1 at a C/5 rate and 800 mAh.g-1 at 2C, with an outstanding coulombic efficiency of 99.95%. Moreover, post-mortem observations show an electrode volume expansion of less than 20% and preservation of the nanostructuration.

  8. Characterization of amorphous organic thin films, determination of precise model for spectroscopic ellipsometry measurements

    International Nuclear Information System (INIS)

    The optical properties of tris(8-hydroxyquinoline) aluminum (Alq3), N,N'-diphenyl-N,N'-bis(1-naphthyl)-1-1'biphenyl-4,4''diamine (α-NPD) and other amorphous organic materials for OLEDs application, e.g. 4,4-bis(2,2-diphenyl vinyl)-1,1-biphenyl (DPVBI) and Spiro-DPVBI have been studied by multi-angle spectroscopic ellipsometry (SE). The thin films of these materials have been deposited by organic vapor phase deposition (OVPD). The structural characterization has been performed using atomic force microscopy (AFM) and X-ray reflectometry (XRR). Comparison of the measurements using these different independent techniques enables the precise determination of the optical model for dielectric function of these thin films. The detail analyses on Alq3 and α-NPD show that the Kim model with Gaussian broadening provides a significantly better fit to the ellipsometry data than the frequently used harmonic oscillator model. This conclusion is further proved by performing similar measurements on other amorphous organic samples for OLEDs application, e.g. DPVBI and Spiro-DPVBI. This result can be explained by the characteristic features of electronic states in organic molecules.

  9. Review of recent developments in amorphous oxide semiconductor thin-film transistor devices

    Energy Technology Data Exchange (ETDEWEB)

    Park, Joon Seok; Maeng, Wan-Joo; Kim, Hyun-Suk [Display Device Laboratory, Samsung Advanced Institute of Technology (SAIT), Mt. 14-1, Nongseo-dong, Yongin, 446-712 (Korea, Republic of); Park, Jin-Seong, E-mail: jinseongpark@dankook.ac.kr [Department of Materials Science and Engineering, Dankook University, Mt. 29, Anseo-dong, Cheonan, 330-714 (Korea, Republic of)

    2012-01-01

    The present article is a review of the recent progress and major trends in the field of thin-film transistor (TFT) research involving the use of amorphous oxide semiconductors (AOS). First, an overview is provided on how electrical performance may be enhanced by the adoption of specific device structures and process schemes, the combination of various oxide semiconductor materials, and the appropriate selection of gate dielectrics and electrode metals in contact with the semiconductor. As metal oxide TFT devices are excellent candidates for switching or driving transistors in next generation active matrix liquid crystal displays (AMLCD) or active matrix organic light emitting diode (AMOLED) displays, the major parameters of interest in the electrical characteristics involve the field effect mobility ({mu}{sub FE}), threshold voltage (V{sub th}), and subthreshold swing (SS). A study of the stability of amorphous oxide TFT devices is presented next. Switching or driving transistors in AMLCD or AMOLED displays inevitably involves voltage bias or constant current stress upon prolonged operation, and in this regard many research groups have examined and proposed device degradation mechanisms under various stress conditions. The most recent studies involve stress experiments in the presence of visible light irradiating the semiconductor, and different degradation mechanisms have been proposed with respect to photon radiation. The last part of this review consists of a description of methods other than conventional vacuum deposition techniques regarding the formation of oxide semiconductor films, along with some potential application fields including flexible displays and information storage.

  10. Carbon films produced from ionic liquid carbon precursors

    Science.gov (United States)

    Dai, Sheng; Luo, Huimin; Lee, Je Seung

    2013-11-05

    The invention is directed to a method for producing a film of porous carbon, the method comprising carbonizing a film of an ionic liquid, wherein the ionic liquid has the general formula (X.sup.+a).sub.x(Y.sup.-b).sub.y, wherein the variables a and b are, independently, non-zero integers, and the subscript variables x and y are, independently, non-zero integers, such that ax=by, and at least one of X.sup.+ and Y.sup.- possesses at least one carbon-nitrogen unsaturated bond. The invention is also directed to a composition comprising a porous carbon film possessing a nitrogen content of at least 10 atom %.

  11. FMR measurement of anisotropy dispersion in amorphous GdFe films

    International Nuclear Information System (INIS)

    Ferromagnetic resonance spectra of a series of evaporated Gd/sub 1-x/Fe/sub x/ amorphous bubble films with x ranging from 67.6 to 81.6 at.% have been measured. From these spectra the g-factor g/sub eff/ was calculated. The experimentally determined values of g/sub eff/ agree well with those expected from Wangness formula. Of particular interest is the comparison of the anisotropy field values H/sub K/ measured by ferromagnetic resonance and by a vibrating sample magnetometer. Whereas FMR can provide information on the anisotropy distribution in the film, VSM yields at best an average value for H/sub K/. In our experiments, several resonance peaks are in general found for a given film indicating the existence of a number of regions having different values of H/sub k//sup prime/=H/sub K/-4πM. Interface effects on the substrate side and oxidation at the air-film interface may result in layers of different chemical composition

  12. Surface and bulk crystallization of amorphous solid water films: Confirmation of "top-down" crystallization

    Science.gov (United States)

    Yuan, Chunqing; Smith, R. Scott; Kay, Bruce D.

    2016-10-01

    The crystallization kinetics of nanoscale amorphous solid water (ASW) films are investigated using temperature-programmed desorption (TPD) and reflection absorption infrared spectroscopy (RAIRS). TPD measurements are used to probe surface crystallization and RAIRS measurements are used to probe bulk crystallization. Isothermal TPD results show that surface crystallization is independent of the film thickness (from 100 to 1000 ML). Conversely, the RAIRS measurements show that the bulk crystallization time increases linearly with increasing film thickness. These results suggest that nucleation and crystallization begin at the ASW/vacuum interface and then the crystallization growth front propagates linearly into the bulk. This mechanism was confirmed by selective placement of an isotopic layer (5% D2O in H2O) at various positions in an ASW (H2O) film. In this case, the closer the isotopic layer was to the vacuum interface, the earlier the isotopic layer crystallized. These experiments provide direct evidence to confirm that ASW crystallization in vacuum proceeds by a "top-down" crystallization mechanism.

  13. Tuning the optoelectronic properties of amorphous MoOx films by reactive sputtering

    DEFF Research Database (Denmark)

    Fernandes Cauduro, André Luis; Fabrim, Zacarias Eduardo; Ahmadpour, Mehrad;

    2015-01-01

    In this letter, we report on the effect of oxygen partial pressure and sputtering power on amorphous DC-sputtered MoOx films. We observe abrupt changes in the optoelectronic properties of the reported films by increasing the oxygen partial pressure from 1.00 ? 10?3 mbar to 1.37 ? 10?3 mbar during...... the sputtering process. A strong impact on the electrical conductivity, varying from 1.6 ? 10?5 S/cm to 3.22 S/cm, and on the absorption coefficient in the range of 0.6–3.0 eV is observed for the nearly stoichiometric MoO3.00 and for the sub-stoichiometric MoO2.57 films, respectively, without modifying...... significantly the microstructure of the studied films. The presence of states within the band gap due to the lack of oxygen is the most probable mechanism for generat- ing a change in electrical conductivity as well as optical absorption in DC-sputtered MoOx. The large tuning range of the optoelectronic...

  14. Yttrium Iron Garnet Thin Films with Very Low Damping Obtained by Recrystallization of Amorphous Material.

    Science.gov (United States)

    Hauser, Christoph; Richter, Tim; Homonnay, Nico; Eisenschmidt, Christian; Qaid, Mohammad; Deniz, Hakan; Hesse, Dietrich; Sawicki, Maciej; Ebbinghaus, Stefan G; Schmidt, Georg

    2016-01-01

    We have investigated recrystallization of amorphous Yttrium Iron Garnet (YIG) by annealing in oxygen atmosphere. Our findings show that well below the melting temperature the material transforms into a fully epitaxial layer with exceptional quality, both structural and magnetic. In ferromagnetic resonance (FMR) ultra low damping and extremely narrow linewidth can be observed. For a 56 nm thick layer a damping constant of α = (6.15 ± 1.50) · 10(-5) is found and the linewidth at 9.6 GHz is as small as 1.30 ± 0.05 Oe which are the lowest values for PLD grown thin films reported so far. Even for a 20 nm thick layer a damping constant of α = (7.35 ± 1.40) · 10(-5) is found which is the lowest value for ultrathin films published so far. The FMR linewidth in this case is 3.49 ± 0.10 Oe at 9.6 GHz. Our results not only present a method of depositing thin film YIG of unprecedented quality but also open up new options for the fabrication of thin film complex oxides or even other crystalline materials.

  15. Reactive Infiltration of Silicon Melt Through Microporous Amorphous Carbon Preforms

    Science.gov (United States)

    Sangsuwan, P.; Tewari, S. N.; Gatica, J. E.; Singh, M.; Dickerson, R.

    1999-01-01

    The kinetics of unidirectional capillary infiltration of silicon melt into microporous carbon preforms have been investigated as a function of the pore morphology and melt temperature. The infiltrated specimens showed alternating bands of dark and bright regions, which corresponded to the unreacted free carbon and free silicon regions, respectively. The decrease in the infiltration front velocity for increasing infiltration distances, is in qualitative agreement with the closed-form solution of capillarity driven fluid flow through constant cross section cylindrical pores. However, drastic changes in the thermal response and infiltration front morphologies were observed for minute differences in the preforms microstructure. This suggests the need for a dynamic percolation model that would account for the exothermic nature of the silicon-carbon chemical reaction and the associated pore closing phenomenon.

  16. Microtribology of Nitrogen-doped Amorphous Carbon Coatings

    Institute of Scientific and Technical Information of China (English)

    Dong F. Wang

    2004-01-01

    The friction, wear and lubrication of carbon nitride coatings on silicon substrates are studied using a spherical diamond counter-face with nano-scale asperities. The first part of this paper clarifies the coating thickness effect on frictional behavior of carbon nitride coatings. The second part of this paper reports empirical data on wear properties in repeated sliding contacts through in situ examination and post-sliding observation. The third part will concentrate on wear mechanisms for the transition from "No observable wear particles" to "Wear particle generation." In light of the above tribological study, the application of carbon nitride coatings to MicroElectroMechanical system (MEMS) is therefore discussed from view points of both microtribology and micromachining.

  17. Measurement and Modeling of Short and Medium Range Order in Amorphous Ta2O5 Thin Films.

    Science.gov (United States)

    Shyam, Badri; Stone, Kevin H; Bassiri, Riccardo; Fejer, Martin M; Toney, Michael F; Mehta, Apurva

    2016-01-01

    Amorphous films and coatings are rapidly growing in importance. Yet, there is a dearth of high-quality structural data on sub-micron films. Not understanding how these materials assemble at atomic scale limits fundamental insights needed to improve their performance. Here, we use grazing-incidence x-ray total scattering measurements to examine the atomic structure of the top 50-100 nm of Ta2O5 films; mirror coatings that show high promise to significantly improve the sensitivity of the next generation of gravitational-wave detectors. Our measurements show noticeable changes well into medium range, not only between crystalline and amorphous, but also between as-deposited, annealed and doped amorphous films. It is a further challenge to quickly translate the structural information into insights into mechanisms of packing and disorder. Here, we illustrate a modeling approach that allows translation of observed structural features to a physically intuitive packing of a primary structural unit based on a kinked Ta-O-Ta backbone. Our modeling illustrates how Ta-O-Ta units link to form longer 1D chains and even 2D ribbons, and how doping and annealing influences formation of 2D order. We also find that all the amorphousTa2O5 films studied in here are not just poorly crystalline but appear to lack true 3D order. PMID:27562542

  18. Electronic structure and defect states of transition films from amorphous to microcrystalline silicon studied by surface photovoltage spectroscopy

    Institute of Scientific and Technical Information of China (English)

    Yu Wei; Wang Chun-Sheng; Lu Wan-Bing; He Jie; Han Xiao-Xia; Fu Guang-Sheng

    2007-01-01

    In this paper, surface photovoltage spectroscopy (SPS) is used to determine the electronic structure of the hydro-genated transition Si films. All samples are prepared by using helicon wave plasma-enhanced chemical vapour deposition technique, the films exhibit a transition from the amorphous phase to the microcrystalline phase with increasing temperature. The film deposited at lower substrate temperature has the amorphous-like electronic structure with two types of dominant defect states corresponding to the occupied Si dangling bond states (D0/D-) and the empty Si dangling states (D+). At higher substrate temperature, the crystallinity of the deposited films increases, while their band gap energy decreases. Meanwhile, two types of additional defect states is incorporate into the films as compared with the amorphous counterpart, which is attributed to the interface defect states between the microcrystalline Si grains and the amorphous matrix. The relative SPS intensity of these two kinds of defect states in samples deposited above 300 C increases first and decreases afterwards, which may be interpreted as a result of the competition between hydrogen release and crystalline grain size increment with increasing substrate temperature.

  19. Measurement and Modeling of Short and Medium Range Order in Amorphous Ta2O5 Thin Films

    Science.gov (United States)

    Shyam, Badri; Stone, Kevin H.; Bassiri, Riccardo; Fejer, Martin M.; Toney, Michael F.; Mehta, Apurva

    2016-08-01

    Amorphous films and coatings are rapidly growing in importance. Yet, there is a dearth of high-quality structural data on sub-micron films. Not understanding how these materials assemble at atomic scale limits fundamental insights needed to improve their performance. Here, we use grazing-incidence x-ray total scattering measurements to examine the atomic structure of the top 50-100 nm of Ta2O5 films; mirror coatings that show high promise to significantly improve the sensitivity of the next generation of gravitational-wave detectors. Our measurements show noticeable changes well into medium range, not only between crystalline and amorphous, but also between as-deposited, annealed and doped amorphous films. It is a further challenge to quickly translate the structural information into insights into mechanisms of packing and disorder. Here, we illustrate a modeling approach that allows translation of observed structural features to a physically intuitive packing of a primary structural unit based on a kinked Ta-O-Ta backbone. Our modeling illustrates how Ta-O-Ta units link to form longer 1D chains and even 2D ribbons, and how doping and annealing influences formation of 2D order. We also find that all the amorphousTa2O5 films studied in here are not just poorly crystalline but appear to lack true 3D order.

  20. Measurement and Modeling of Short and Medium Range Order in Amorphous Ta2O5 Thin Films

    Science.gov (United States)

    Shyam, Badri; Stone, Kevin H.; Bassiri, Riccardo; Fejer, Martin M.; Toney, Michael F.; Mehta, Apurva

    2016-01-01

    Amorphous films and coatings are rapidly growing in importance. Yet, there is a dearth of high-quality structural data on sub-micron films. Not understanding how these materials assemble at atomic scale limits fundamental insights needed to improve their performance. Here, we use grazing-incidence x-ray total scattering measurements to examine the atomic structure of the top 50–100 nm of Ta2O5 films; mirror coatings that show high promise to significantly improve the sensitivity of the next generation of gravitational-wave detectors. Our measurements show noticeable changes well into medium range, not only between crystalline and amorphous, but also between as-deposited, annealed and doped amorphous films. It is a further challenge to quickly translate the structural information into insights into mechanisms of packing and disorder. Here, we illustrate a modeling approach that allows translation of observed structural features to a physically intuitive packing of a primary structural unit based on a kinked Ta-O-Ta backbone. Our modeling illustrates how Ta-O-Ta units link to form longer 1D chains and even 2D ribbons, and how doping and annealing influences formation of 2D order. We also find that all the amorphousTa2O5 films studied in here are not just poorly crystalline but appear to lack true 3D order. PMID:27562542

  1. Characterization of superconducting magnesium-diboride films on glassy carbon and sapphire substrates

    Energy Technology Data Exchange (ETDEWEB)

    Andrade, E.; Zavala, E. P. [Instituto de Fisica, UNAM, Apartado Postal 20-364, 01000 Mexico D. F. (Mexico); Rocha, M. F. [Escuela Superior de Ingenieria Mecanica y Electrica, IPN, Mexico D. F. (Mexico); Jergel, M.; Falcony, C. [Departamento de Fisica, CINVESTAV-IPN, Apartado postal 14-740, 07000 Mexico D. F. (Mexico)

    2008-02-15

    IBA methods were applied to measure elemental depth profiles of precursors and superconducting MgB{sub 2} thin films deposited on glassy carbon (Good Fellows) and sapphire (Al{sub 2}O{sub 3}) substrates. For each type of substrates we obtained a pair of samples i.e. one amorphous precursor and one superconducting film which were then characterized. A 3{sup H}e{sup +} beam was used to bombard both, precursors and superconducting films in order to obtain the samples elemental composition profiles. The zero resistance T{sub co} and the middle of transition T{sub cm} values were 26.0 K and 29.7 K for the MgB{sub 2} film deposited on glassy carbon substrate. In the case of sapphire substrate the T{sub co} and T{sub cm} values were 25.0 K and 27.9 K, respectively. (Author)

  2. Electromagnetic characteristics of carbon nanotube film materials

    Directory of Open Access Journals (Sweden)

    Zhang Wei

    2015-08-01

    Full Text Available Carbon nanotube (CNT possesses remarkable electrical conductivity, which shows great potential for the application as electromagnetic shielding material. This paper aims to characterize the electromagnetic parameters of a high CNT loading film by using waveguide method. The effects of layer number of CNT laminate, CNT alignment and resin impregnation on the electromagnetic characteristics were analyzed. It is shown that CNT film exhibits anisotropic electromagnetic characteristic. Pristine CNT film shows higher real part of complex permittivity, conductivity and shielding effectiveness when the polarized direction of incident wave is perpendicular to the winding direction of CNT film. For the CNT film laminates, complex permittivity increases with increasing layer number, and correspondingly, shielding effectiveness decreases. The five-layer CNT film shows extraordinary shielding performance with shielding effectiveness ranging from 67 dB to 78 dB in X-band. Stretching process induces the alignment of CNTs. When aligned direction of CNTs is parallel to the electric field, CNT film shows negative permittivity and higher conductivity. Moreover, resin impregnation into CNT film leads to the decrease of conductivity and shielding effectiveness. This research will contribute to the structural design for the application of CNT film as electromagnetic shielding materials.

  3. Crystallization of amorphous zirconium thin film using ion implantation by a plasma focus of 1 kJ

    Energy Technology Data Exchange (ETDEWEB)

    Rico, L. [Instituto de Fisica Rosario (CONICET-UNR), Bvrd. 27 de Febrero 210 Bis, S2000EZP Rosario (Argentina)], E-mail: bernardo@fceia.unr.edu.ar; Gomez, B.J.; Feugeas, J. [Instituto de Fisica Rosario (CONICET-UNR), Bvrd. 27 de Febrero 210 Bis, S2000EZP Rosario (Argentina); Sanctis, O. de [Instituto de Fisica Rosario (CONICET-UNR), Bvrd. 27 de Febrero 210 Bis, S2000EZP Rosario (Argentina); Laboratorio de Materiales Ceramicos, Universidad Nacional de Rosario, Pellegrini 250, 2000 Rosario (Argentina)

    2007-10-31

    In this work preliminary results of amorphous zirconium crystallization using ion beam pulses are presented. Energetic argon- and oxygen-ion beams generated by a plasma focus device were used to promote crystallization on amorphous ZrO{sub 2}-2.5 mol% Y{sub 2}O{sub 3} film deposited by chemical solution deposition onto silica glass substrate. The films were burnt at 370 deg. C for 1 h in normal atmosphere previous to plasma irradiation. The irradiation was performed by means of successive pulses of ion beams. The evolution of the surface morphology and crystallization was followed by AFM and X-rays diffraction in a grazing incidence asymmetric Bragg geometry (GIAB), respectively. Argon-irradiated films showed highly nucleated cubic zirconia after 10 pulses. On the other hand, oxygen-irradiated films showed a delayed and less extensive cubic nucleation, but a more ordered structure and well-defined grains.

  4. Anode properties of silicon-rich amorphous silicon suboxide films in all-solid-state lithium batteries

    Science.gov (United States)

    Miyazaki, Reona; Ohta, Narumi; Ohnishi, Tsuyoshi; Takada, Kazunori

    2016-10-01

    This paper reports the effects of introducing oxygen into amorphous silicon films on their anode properties in all-solid-state lithium batteries. Although poor cycling performance is a critical issue in silicon anodes, it has been effectively improved by introducing even a small amount of oxygen, that is, even in Si-rich amorphous silicon suboxide (a-SiOx) films. Because of the small amount of oxygen in the films, high cycling performance has been achieved without lowering the capacity and power density: an a-Si film delivers discharge capacity of 2500 mAh g-1 under high discharge current density of 10 mA cm-2 (35 C). These results demonstrate that a-SiOx is a promising candidate for high-capacity anode materials in solid-state batteries.

  5. Steady-state photoconductivity of amorphous (As4S3Se3)1-x:Snx films

    Science.gov (United States)

    Iaseniuc, O. V.; Iovu, M. S.; Cojocaru, I. A.; Prisacar, A. M.

    2015-02-01

    Amorphous arsenic trisulfide (As2S3) and arsenic triselenide (As2Se3) are among widely investigated amorphous materials due to its interesting electrical, optical and photoelectrical properties. In order to improve the physical properties and recording characteristics, and to extend the spectral range of photosensibility, a special interest represents the mixed amorphous materials, like (As2S3):(As2Se3). Chalcogenide vitreous semiconductors (ChVS) of the As-S-Se system exhibit photostructural transformations with reversible and irreversible properties, and are promising materials as registration media for holography and optical information, for fabrication of diffractive elements, and other optoelectronic applications. Because many optoelectronic devices on amorphous semiconductors are based on the photoconductivity effect, special interests represent investigation of the stationary and non-stationary characteristics of photoconductivity. In this paper the experimental results of steady-state photoconductivity and holographic characteristics of amorphous (As4S3Se3)1-x:Snx thin films are presented. It was shown that the photoconductivity spectra depend on the polarity on the top illuminated electrode and on the Sn concentration in the host glass. The photosensitivity of amorphous ((As4S3Se3)1-x:Snx thin films is almost constant for all Sn-containing glasses. The Moss rule was used for determination of the optical forbidden gap Eg from the photoconductivity spectra. It was demonstrated that the investigated amorphous films are sensitive to the light irradiation and can be used as effective registration media for holographic information. The relaxation of photodarkening in amorphous (As4S3Se3)1-x:Snx thin films was investigated and was shown that the relaxation curves of transmittance T/T0 = f(t) can be described the stretch exponential function T(t)/T(0) = A0+Aexp[-(t-t0)/τ] (1-β) . The kinetics of diffraction efficiency growth η(t) was measured by registration of

  6. Solar cells and thin film LED using amorphous SiC. Amorphous SiC wo mochiita taiyou denchi oyobi usumaku LED

    Energy Technology Data Exchange (ETDEWEB)

    Hamakawa, Y. (Osaka Univ., Osaka (Japan). Faculty of Engineering Science)

    1990-03-25

    This paper introduced the photoelectric properties of amorphous SiC (a-SiC), application to highly efficient solar cells, application to wide area emitting elements such as LED (light emitting diode) and application to OEIC (optoelectronic integrated circuit) which is expected in near future. The light sensitizing effect in which photoconductivity of a-SiC:H film increases 2-3 figures by B dopping, was found. Flexible and wide area thin film LED has been able to manufacture by this discovery. In addition, highly efficient conversion rate has been able to get by the technical development such as solar cells made of a-SiC/ a-Si hetrojunction. Further, wide area sollar cells has been able to manufacture on any substrate by the development of TFLED (thin film light emitting diode). The application of TFLED made of SiC to OEIC is also investigated. 18 refs., 15 figs., 2 tabs.

  7. Mapping residual organics and carbonate at grain boundaries and the amorphous interphase in mouse incisor enamel.

    Science.gov (United States)

    Gordon, Lyle M; Joester, Derk

    2015-01-01

    Dental enamel has evolved to resist the most grueling conditions of mechanical stress, fatigue, and wear. Adding insult to injury, it is exposed to the frequently corrosive environment of the oral cavity. While its hierarchical structure is unrivaled in its mechanical resilience, heterogeneity in the distribution of magnesium ions and the presence of Mg-substituted amorphous calcium phosphate (Mg-ACP) as an intergranular phase have recently been shown to increase the susceptibility of mouse enamel to acid attack. Herein we investigate the distribution of two important constituents of enamel, residual organic matter and inorganic carbonate. We find that organics, carbonate, and possibly water show distinct distribution patterns in the mouse enamel crystallites, at simple grain boundaries, and in the amorphous interphase at multiple grain boundaries. This has implications for the resistance to acid corrosion, mechanical properties, and the mechanism by which enamel crystals grow during amelogenesis.

  8. In Situ Mechanical Property Measurements of Amorphous Carbon-Boron Nitride Nanotube Nanostructures

    Science.gov (United States)

    Kim, Jae-Woo; Lin, Yi; Nunez, Jennifer Carpena; Siochi, Emilie J.; Wise, Kristopher E.; Connell, John W.; Smith, Michael W.

    2011-01-01

    To understand the mechanical properties of amorphous carbon (a-C)/boron nitride nanotube (BNNT) nanostructures, in situ mechanical tests are conducted inside a transmission electron microscope equipped with an integrated atomic force microscope system. The nanotube structure is modified with amorphous carbon deposited by controlled electron beam irradiation. We demonstrate multiple in situ tensile, compressive, and lap shear tests with a-C/BNNT hybrid nanostructures. The tensile strength of the a-C/BNNT hybrid nanostructure is 5.29 GPa with about 90 vol% of a-C. The tensile strength and strain of the end-to-end joint structure with a-C welding is 0.8 GPa and 5.2% whereas the lap shear strength of the side-by-side joint structure with a-C is 0.25 GPa.

  9. In situ mechanical property measurements of amorphous carbon-boron nitride nanotube nanostructures

    Science.gov (United States)

    Kim, Jae-Woo; Carpena Núñez, Jennifer; Siochi, Emilie J.; Wise, Kristopher E.; Lin, Yi; Connell, John W.; Smith, Michael W.

    2012-01-01

    To understand the mechanical properties of amorphous carbon (a-C)/boron nitride nanotube (BNNT) nanostructures, in situ mechanical tests are conducted inside a transmission electron microscope equipped with an integrated atomic force microscope system. The nanotube structure is modified with amorphous carbon deposited by controlled electron beam irradiation. We demonstrate multiple in situ tensile, compressive, and lap shear tests with a-C/BNNT hybrid nanostructures. The tensile strength of the a-C/BNNT hybrid nanostructure is 5.29 GPa with about 90 vol% of a-C. The tensile strength and strain of the end-to-end joint structure with a-C welding is 0.8 GPa and 5.2% whereas the lap shear strength of the side-by-side joint structure with a-C is 0.25 GPa.

  10. A transparent hybrid of nanocrystalline cellulose and amorphous calcium carbonate nanoparticles

    Science.gov (United States)

    Gebauer, Denis; Oliynyk, Vitaliy; Salajkova, Michaela; Sort, Jordi; Zhou, Qi; Bergström, Lennart; Salazar-Alvarez, German

    2011-09-01

    Nanocellulose hybrids are promising candidates for biodegradable multifunctional materials. Hybrids of nanocrystalline cellulose (NCC) and amorphous calcium carbonate (ACC) nanoparticles were obtained through a facile chemical approach over a wide range of compositions. Controlling the interactions between NCC and ACC results in hard, transparent structures with tunable composition, homogeneity and anisotropy.Nanocellulose hybrids are promising candidates for biodegradable multifunctional materials. Hybrids of nanocrystalline cellulose (NCC) and amorphous calcium carbonate (ACC) nanoparticles were obtained through a facile chemical approach over a wide range of compositions. Controlling the interactions between NCC and ACC results in hard, transparent structures with tunable composition, homogeneity and anisotropy. Electronic supplementary information (ESI) available: Additional experimental procedures and results. See DOI: 10.1039/c1nr10681c

  11. Effect of applied dc bias voltage on composition, chemical bonding and mechanical properties of carbon nitride films prepared by PECVD

    Institute of Scientific and Technical Information of China (English)

    LI Hong-xuan; XU Tao; HAO Jun-ying; CHEN Jian-min; ZHOU Hui-di; XUE Qun-ji; LIU Hui-wen

    2004-01-01

    Carbon nitride films were deposited on Si (100) substrates using plasma-enhanced chemical vapor deposition (PECVD) technique from CH4 and N2 at different applied dc bias voltage. The microstructure, composition and chemical bonding of the resulting films were characterized by Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). The mechanical properties such as hardness and elastic modulus of the films were evaluated using nano-indentation. As the results, the Raman spectra, showing the G and D bands, indicate the amorphous structure of the films. XPS and FTIR measurements demonstrate the existence of various carbon-nitride bonds in the films and the hydrogenation of carbon nitride phase. The composition ratio of N to C, the nano-hardness and the elastic modulus of the carbon nitride films increase with increasing dc bias voltage and reach the maximums at a dc bias voltage of 300 V, then they decrease with further increase of the dc bias voltage. Moreover, the XRD analyses indicate that the carbon nitride film contains some polycrystalline C3N4 phase embedded in the amorphous matrix at optimized deposition condition of dc bias voltage of 300 V.

  12. Deposition and characterization of amorphous silicon with embedded nanocrystals and microcrystalline silicon for thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ambrosio, R., E-mail: rambrosi@uacj.mx [Instituto Nacional de Astrofísica, Óptica y Electrónica, INAOE, Puebla (Mexico); Instituto de Ingeniería y Tecnología, Universidad Autónoma de Ciudad Juárez, UACJ, C.J., Chihuahua (Mexico); Moreno, M.; Torres, A. [Instituto Nacional de Astrofísica, Óptica y Electrónica, INAOE, Puebla (Mexico); Carrillo, A. [Instituto de Ingeniería y Tecnología, Universidad Autónoma de Ciudad Juárez, UACJ, C.J., Chihuahua (Mexico); Vivaldo, I.; Cosme, I. [Instituto Nacional de Astrofísica, Óptica y Electrónica, INAOE, Puebla (Mexico); Heredia, A. [Universidad Popular Autónoma del Estado de Puebla, Puebla (Mexico)

    2015-09-15

    Highlights: • Nanostructured silicon thin films were deposited by PECVD. • Polymorphous and microcrystalline were obtained varying the pressure and power. • Structural and optoelectronics properties were studied. • The σ{sub dark} changed by 5 order of magnitude under illumination, V{sub d} was at 2.5 A/s. • The evidence of embedded nanocrystals into the amorphous matrix was investigated. - Abstract: Amorphous silicon thin films with embedded nanocrystals and microcrystalline silicon were deposited by the standard Radio Frequency (RF) Plasma Enhanced Chemical Vapor Deposition (PECVD) technique, from SiH{sub 4}, H{sub 2}, Ar gas mixture at substrate temperature of 200 °C. Two series of films were produced varying deposition parameters as chamber pressure and RF power density. The chemical bonding in the films was characterized by Fourier transform infrared spectroscopy, where it was observed a correlation between the hydrogen content and the morphological and electrical properties in the films. Electrical and optical parameters were extracted in both series of films, as room temperature conductivity (σ{sub RT}), activation energy (E{sub a}), and optical band gap (E{sub g}). As well, structural analysis in the films was performed by Raman spectroscopy and Atomic Force Microscopy (AFM), which gives an indication of the films crystallinity. The photoconductivity changed in a range of 2 and 6 orders of magnitude from dark to AM 1.5 illumination conditions, which is of interest for thin film solar cells applications.

  13. Capillarity creates single-crystal calcite nanowires from amorphous calcium carbonate.

    Science.gov (United States)

    Kim, Yi-Yeoun; Hetherington, Nicola B J; Noel, Elizabeth H; Kröger, Roland; Charnock, John M; Christenson, Hugo K; Meldrum, Fiona C

    2011-12-23

    Single-crystal calcite nanowires are formed by crystallization of morphologically equivalent amorphous calcium carbonate (ACC) particles within the pores of track etch membranes. The polyaspartic acid stabilized ACC is drawn into the membrane pores by capillary action, and the single-crystal nature of the nanowires is attributed to the limited contact of the intramembrane ACC particle with the bulk solution. The reaction environment then supports transformation to a single-crystal product.

  14. Effect of interface layers on electron field emission properties of amorphous diamond films

    Institute of Scientific and Technical Information of China (English)

    茅东升[1; 赵俊[2; 李炜[3; 王曦[4; 柳襄怀[5; 诸玉坤[6; 范忠[7; 周江云[8; 李琼[9; 徐静芳[10

    1999-01-01

    Hydrogen-free high sp~3 content amorphous diamond (AD) films are deposited on three different substrates——Au-coated Si (Au/Si), Ti-coated Si (Ti/Si) and Si wafers. Electron field emission properties and fluorescent displays of the above AD films are studied by using a sample diode structure. The compositional profile of the interfaces of AD/Ti/Si and AD/Si is examined by using secondary ions mass spectroscopy (SIMS). Because of the reaction and interdiffusion between Ti and C, the formation of a thin TiC intermediate layer is possible between AD film and Ti/Si substrate. The field emission properties of AD/Ti/Si are sufficiently improved, especially its uniformity. A field emission density of 0.352 mA/cm~2 is obtained under an electric field of 19.7 V/μm. The value is much more than that of AD/Au/Si and AD/Si under the same electric field.

  15. Hydrogenated amorphous silicon sensors based on thin film on ASIC technology

    CERN Document Server

    Despeisse, M; Anelli, G; Jarron, P; Kaplon, J; Rusack, R; Saramad, S; Wyrsch, N

    2006-01-01

    The performance and limitations of a novel detector technology based on the deposition of a thin-film sensor on top of processed integrated circuits have been studied. Hydrogenated amorphous silicon (a-Si:H) films have been deposited on top of CMOS circuits developed for these studies and the resulting "thin-film on ASIC" (TFA) detectors are presented. The leakage current of the a-Si:H sensor at high reverse biases turns out to be an important parameter limiting the performance of a TFA detector. Its detailed study and the pixel segmentation of the detector are presented. High internal electric fields (in the order of 10/sup 4/-10/sup 5/ V/cm) can be built in the a-Si:H sensor and overcome the low mobility of electrons and holes in a-Si:H. Signal induction by generated carrier motion and speed in the a-Si:H sensor have been studied with a 660 nm pulsed laser on a TFA detector based on an ASIC integrating 5 ns peaking time pre- amplifiers. The measurement set-up also permits to study the depletion of the senso...

  16. Crystallization of amorphous silicon thin films using nanoenergetic intermolecular materials with buffer layers

    Science.gov (United States)

    Lee, Choong Hee; Jeong, Tae Hoon; Kim, Do Kyung; Jeong, Woong Hee; Kang, Myung-Koo; Hwang, Tae Hyung; Kim, Hyun Jae

    2009-02-01

    Optimization of the crystallization of amorphous silicon (a-Si) using a mixture of nanoenergetic materials of iron oxide/aluminum (Fe 2O 3/Al) was studied. To achieve high-quality polycrystalline Si (poly-Si) thin films, silicon oxide (SiO 2) and silver (Ag) layer were deposited on the a-Si as buffer layers to prevent the metal diffusion in a-Si during thermite reaction and to transport the thermal energy released from nanoenergetic materials, respectively. Raman measurement was used to define the crystallinity of poly-Si. For molar ratio of Al and Fe of 2 with 100-nm-thick-SiO 2, Raman measurement showed the 519.59 cm -1 of peak position and the 5.08 cm -1 of full width at half maximum with 353 MPa of low tensile stress indicating high quality poly-Si thin film. These results showed that optimized thermite reaction could be used successfully in crystallization of a-Si to high -quality poly-Si thin films.

  17. [The Influence of Deposition Pressure on the Properties of Hydrogenated Amorphous Silicon Thin Films].

    Science.gov (United States)

    Yuan, Jun-bao; Yang, Wen; Chen, Xiao-bo; Yang, Pei-zhi; Song, Zhao-ning

    2016-02-01

    Hydrogenated amorphous silicon (a-Si:H) thin films on soda-lime glass substrates were deposited by plasma enhanced chemical vapor deposition (PECVD) using disilane and hydrogen as source gases. To study the influence of deposition pressure on the deposition rate, optical band gap and structure factor, a surface profilometer, an ultraviolet-visible spectrometer, a Fourier transform infrared (FTIR) spectrometer and a scanning electron microscopy (SEM) were used to characterize the deposited thin films. It is found that the deposition rate firstly increased and then decreased and the optical band gap monotonically decreased with the increasing deposition pressure. Moreover, the formation of SiH bond was preferable to the formation of SH₂ or SiH₃ bond when the deposition pressure was less than 210 Pa, while it was opposite when the deposition pressure is higher than 210 Pa. Finally, the deposition pressure in the range of 110~210 Pa was found to be more suitable for the preparation of high quality a-Si:H thin films. PMID:27209724

  18. Anisotropic imprint of amorphization and phase separation in manganite thin films via laser interference irradiation

    KAUST Repository

    Ding, Junfeng

    2014-09-16

    Materials with mesoscopic structural and electronic phase separation, either inherent from synthesis or created via external means, are known to exhibit functionalities absent in the homogeneous counterparts. One of the most notable examples is the colossal magnetoresistance discovered in mixed-valence manganites, where the coexistence of nano-to micrometer-sized phase-separated domains dictates the magnetotransport. However, it remains challenging to pattern and process such materials into predesigned structures and devices. In this work, a direct laser interference irradiation (LII) method is employed to produce periodic stripes in thin films of a prototypical phase-separated manganite Pr0.65(Ca0.75Sr0.25)0.35MnO3 (PCSMO). LII induces selective structural amorphization within the crystalline PCSMO matrix, forming arrays with dimensions commensurate with the laser wavelength. Furthermore, because the length scale of LII modification is compatible to that of phase separation in PCSMO, three orders of magnitude of increase in magnetoresistance and significant in-plane transport anisotropy are observed in treated PCSMO thin films. Our results show that LII is a rapid, cost-effective and contamination-free technique to tailor and improve the physical properties of manganite thin films, and it is promising to be generalized to other functional materials.

  19. Interface Study on Amorphous Indium Gallium Zinc Oxide Thin Film Transistors Using High-k Gate Dielectric Materials

    OpenAIRE

    Yu-Hsien Lin; Jay-Chi Chou

    2015-01-01

    We investigated amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFTs) using different high-k gate dielectric materials such as silicon nitride (Si3N4) and aluminum oxide (Al2O3) at low temperature process (

  20. Estimation of the impact of electrostatic discharge on density of states in hydrogenated amorphous silicon thin-film transistors

    NARCIS (Netherlands)

    Tosic Golo, Natasa; Wal, van der Siebrigje; Kuper, F.G.; Mouthaan, A.J.

    2002-01-01

    The objective of this letter is to give an estimation of the impact of an electrostatic discharge (ESD) stress on the density of states (DOS) within the energy gap of hydrogenated amorphous silicon (a-Si:H) thin-film transistors. ESD stresses were applied by means of a transmission line model tester

  1. Characterization of amorphous multilayered ZnO-SnO2 heterostructure thin films and their field effect electronic properties

    International Nuclear Information System (INIS)

    Multilayered ZnO-SnO2 heterostructure thin films were produced using pulsed laser ablation of pie-shaped ZnO-SnO2 oxides target, and their structural and field effect electronic transport properties were investigated as a function of the thickness of the ZnO and SnO2 layers. The films have an amorphous multilayered heterostructure composed of the periodic stacking of the ZnO and SnO2 layers. The field effect electronic properties of amorphous multilayered ZnO-SnO2 heterostructure thin film transistors (TFTs) are highly dependent on the thickness of the ZnO and SnO2 layers. The highest electron mobility of 37 cm2/V s, a low subthreshold swing of a 0.19 V/decade, a threshold voltage of 0.13 V, and a high drain current on-to-off ratio of ∼1010 obtained for the amorphous multilayered ZnO(1.5 nm)-SnO2(1.5 nm) heterostructure TFTs. These results are presumed to be due to the unique electronic structure of an amorphous multilayered ZnO-SnO2 heterostructure film consisting of ZnO, SnO2, and ZnO-SnO2 interface layers

  2. Low-temperature formation of source–drain contacts in self-aligned amorphous oxide thin-film transistors

    NARCIS (Netherlands)

    Nag, M.; Muller, R.; Steudel, S.; Smout, S.; Bhoolokam, A.; Myny, K.; Schols, S.; Genoe, J.; Cobb, B.; Kumar, A.; Gelinck, G.; Fukui, Y.; Groeseneken, G.; Heremans, P.

    2015-01-01

    We demonstrated self-aligned amorphous-Indium-Gallium-Zinc-Oxide (a-IGZO) thin-film transistors (TFTs) where the source–drain (S/D) regions were made conductive via chemical reduction of the a-IGZO via metallic calcium (Ca). Due to the higher chemical reactivity of Ca, the process can be operated at

  3. Surface properties of diamond-like carbon films prepared by CVD and PVD methods

    Institute of Scientific and Technical Information of China (English)

    Liu Dong-Ping; Liu Yan-Hong; Chen Bao-Xiang

    2006-01-01

    Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance-plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered-pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscopebased tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp3 hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp3 hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.

  4. Direct observation of small cluster mobility and ripening. [during annealing of metal films on amorphous substrates

    Science.gov (United States)

    Heinemann, K.; Poppa, H.

    1975-01-01

    Direct evidence is reported for the simultaneous occurrence of Ostwald ripening and short-distance cluster mobility during annealing of discontinuous metal films on clean amorphous substrates. The annealing characteristics of very thin particulate deposits of silver on amorphized clean surfaces of single crystalline thin graphite substrates were studied by in-situ transmission electron microscopy (TEM) under controlled environmental conditions (residual gas pressure of 10 to the minus 9th power torr) in the temperature range from 25 to 450 C. Sputter cleaning of the substrate surface, metal deposition, and annealing were monitored by TEM observation. Pseudostereographic presentation of micrographs in different annealing stages, the observation of the annealing behavior at cast shadow edges, and measurements with an electronic image analyzing system were employed to aid the visual perception and the analysis of changes in deposit structure recorded during annealing. Slow Ostwald ripening was found to occur in the entire temperature range, but the overriding surface transport mechanism was short-distance cluster mobility.

  5. X-ray magnetic absorption in Fe-Tb amorphous thin films

    CERN Document Server

    Kim, Chan Wook; Watanabe, Yasuhiro

    1999-01-01

    In order to investigate the magnetic structure of Fe-Tb amorphous thin films, we have performed magnetic circular dichroism (MCD) measurements by using the circularly polarized X-ray at the Fe K- and the Tb L2,3-edges in Fe sub 8 sub 8 Tb sub 1 sub 2 , Fe sub 8 sub 0 Tb sub 2 sub 0 , and Fe sub 6 sub 2 Tb sub 3 sub 8. In all samples, the spin-dependent absorption effects, DELTA mu t, were observed. Also, elementary information was obtained on the spin polarizations of the p- and the d-projected electrons lying in the unoccupied states near the Fermi levels in the samples.

  6. Acoustically induced optical second harmonic generation in hydrogenated amorphous silicon films

    CERN Document Server

    Ebothe, J; Cabarrocas, P R I; Godet, C; Equer, B

    2003-01-01

    Acoustically induced second harmonic generation (AISHG) in hydrogenated amorphous silicon (a-Si : H) films of different morphology has been observed. We have found that with increasing acoustical power, the optical SHG of Gd : YAB laser light (lambda = 2.03 mu m) increases and reaches its maximum value at an acoustical power density of about 2.10 W cm sup - sup 2. With decreasing temperature, the AISHG signal strongly increases below 48 K and correlates well with the temperature behaviour of differential scanning calorimetry indicating near-surface temperature phase transition. The AISHG maxima were observed at acoustical frequencies of 10-11, 14-16, 20-22 and 23-26 kHz. The independently performed measurements of the acoustically induced IR spectra have shown that the origin of the observed phenomenon is the acoustically induced electron-phonon anharmonicity in samples of different morphology.

  7. Process and properties of electroless Ni-W-B amorphous electrical resistance film

    Institute of Scientific and Technical Information of China (English)

    ZHU Xiao-yun; GUO Zhong-cheng; XU Rui-dong

    2004-01-01

    The process and properties of electroless plating Ni-W-B alloy have been studied. The results show that the deposits containing W and B are obtained, and the deposition rate of the bath is increased with increase of W content when a certain amount of sodium tungstate solution is added in the Ni-B bath. The Ni-W-B alloy is amorphous as deposition and its resistivity increases directly with the increase of W content in the coating, but decreases gradually with increasing the deposit thickness. XRD and SEM show that the distributions of W and B in the Ni-W-B alloy film are very uniform and dispersed without any segregation.

  8. Plasma optical emission spectroscopy diagnostic during amorphous silicon thin films deposition by Rf sputtering technique

    International Nuclear Information System (INIS)

    This paper deals with the study of the glow discharge, used for amorphous silicon thin films deposition by Rf sputtering technique. The produced plasma is investigated by mean of the optical emission spectroscopy (OES) analysis. Different plasmas obtained with changing the gas pressure and Rf powers were analysed at different positions in the inter-electrode space. Emission lines from Ar, Si, Si+ and Ar+ were observed in the visible region. It was found that emission intensities of all the observed lines have a spatial Gaussian shape. The maximum intensity is located in the core of the plasma and decrease in the electrodes region. The ratio between the Si and Ar+ intensities (ISi/IAr+), in the target region, is proposed as a new tool to estimate the Ar sputtering yield. This ratio was compared to the theoretical calculated sputtering yield. The difference between these two quantities is exploited to determine the contribution of fast Ar neutrals in the sputtering process.

  9. Flux-flow noise driven by quantum fluctuations in a thick amorphous film

    Energy Technology Data Exchange (ETDEWEB)

    Okuma, S. [Research Center for Low Temperature Physics, Tokyo Institute of Technology, 2-12-1 Ohokayama, Meguro-ku, Tokyo 152-8551 (Japan)]. E-mail: sokuma@o.cc.titech.ac.jp; Kainuma, K. [Research Center for Low Temperature Physics, Tokyo Institute of Technology, 2-12-1 Ohokayama, Meguro-ku, Tokyo 152-8551 (Japan); Kishimoto, T. [Research Center for Low Temperature Physics, Tokyo Institute of Technology, 2-12-1 Ohokayama, Meguro-ku, Tokyo 152-8551 (Japan); Kohara, M. [Research Center for Low Temperature Physics, Tokyo Institute of Technology, 2-12-1 Ohokayama, Meguro-ku, Tokyo 152-8551 (Japan)

    2006-10-01

    We measure the voltage-noise spectrum S {sub V}(f) (where f is a frequency) as well as the time (t)-dependent component {delta}V(t) of the flux-flow voltage in the low temperature liquid phase of a thick amorphous Mo {sub x}Si{sub 1-x} film. In the quantum-liquid phase both the amplitude vertical bar {delta}V vertical bar of voltage fluctuations and the asymmetry of the probability distribution of {delta}V(t) show an anomalous increase; the spectral shape of S {sub V}(f) is of a Lorentzian type, suggesting the shot-noise-like vortex motion with a large 'vortex-bundle size' and short characteristic time.

  10. Numerical simulation of offset-drain amorphous oxide-based thin-film transistors

    Science.gov (United States)

    Jeong, Jaewook

    2016-11-01

    In this study, we analyzed the electrical characteristics of amorphous indium–gallium–zinc-oxide (a-IGZO) thin-film transistors (TFTs) with an offset-drain structure by technology computer aided design (TCAD) simulation. When operating in a linear region, an enhancement-type TFT shows poor field-effect mobility because most conduction electrons are trapped in acceptor-like defects in an offset region when the offset length (L off) exceeds 0.5 µm, whereas a depletion-type TFT shows superior field-effect mobility owing to the high free electron density in the offset region compared with the trapped electron density. When operating in the saturation region, both types of TFTs show good field-effect mobility comparable to that of a reference TFT with a large gate overlap. The underlying physics of the depletion and enhancement types of offset-drain TFTs are systematically analyzed.

  11. Enhanced light trapping with double-groove grating in thin-film amorphous silicon solar cells

    Science.gov (United States)

    Wu, Jun

    2016-05-01

    A design to enhance light absorption in thin-film amorphous silicon (a-Si) solar cells is proposed. It is achieved by patterning a double-groove grating with waveguide layer as the absorbing layer and coating a double-groove grating anti-reflective layer in the front window of the cell. The broadband absorption under normal incidence can be achieved for both TE and TM polarizations. It is shown that the averaged integrated absorptions have very large angle independence for the optimized solar cell. An qualitative understanding of such broadband enhanced absorption effect, which is attributed to the guided mode resonance, is presented. The conclusions can be exploited to guide the design of solar cells based on a grating structure.

  12. Thermal stability and the origin of perpendicular anisotropy in amorphous Tb-Fe-Co films

    International Nuclear Information System (INIS)

    Both the thermal stability of the material parameters and the effect of annealing on magnetic anisotropy have been investigated for amorphous Tb27Fe53Co20 films. On the basis of the coexistence of the pseudodipolar interaction and the stress coupled with magnetostriction, a numerical computation is performed on fitting the change of the perpendicular anisotropy Ku with temperature and Ku variations affected by annealing at the various temperatures, respectively. We show that the anisotropy originates from both the internal stress and the pseudodipolar interaction with the anisotropic part of the Ruderman-Kittel-Kasuya-Yosida exchange interaction, in which a contribution from Tb-Fe atom pairs is dominant. The change of the material parameters occurs after relatively short annealing. We attribute it to the thermal relaxation of internal stress at lower temperatures

  13. Hydrogen plasma treatment for improved conductivity in amorphous aluminum doped zinc tin oxide thin films

    Directory of Open Access Journals (Sweden)

    M. Morales-Masis

    2014-09-01

    Full Text Available Improving the conductivity of earth-abundant transparent conductive oxides (TCOs remains an important challenge that will facilitate the replacement of indium-based TCOs. Here, we show that a hydrogen (H2-plasma post-deposition treatment improves the conductivity of amorphous aluminum-doped zinc tin oxide while retaining its low optical absorption. We found that the H2-plasma treatment performed at a substrate temperature of 50 °C reduces the resistivity of the films by 57% and increases the absorptance by only 2%. Additionally, the low substrate temperature delays the known formation of tin particles with the plasma and it allows the application of the process to temperature-sensitive substrates.

  14. Performance enhancement of amorphous indium-zinc-oxide thin film transistors by microwave annealing

    Science.gov (United States)

    Xu, Rui; He, Jian; Li, Wei; Paine, David C.

    2015-12-01

    The effect of microwave annealing on the field effect mobility and threshold voltage of amorphous indium zinc oxide (a-IZO) thin film transistors (TFTs) is reported. A control device with traditional hotplate annealing at 200 °C for 1 h was applied for comparison. The results show that both microwave annealing and low-temperature hotplate annealing increase the field effect mobility from 12.3 cm2/V s in as-deposited state to ∼19 cm2/V s in annealed state. However, the negative shift in threshold voltage with microwave annealing (from 0.23 V to -2.86 V) is smaller than that with low-temperature hotplate annealing (to -9 V). A mechanism related with the electrical properties of a-IZO material is proposed. This rapid low-temperature annealing technology makes a-IZO TFTs promising for use in flexible, transparent electronics.

  15. Conduction mechanism in amorphous InGaZnO thin film transistors

    Science.gov (United States)

    Bhoolokam, Ajay; Nag, Manoj; Steudel, Soeren; Genoe, Jan; Gelinck, Gerwin; Kadashchuk, Andrey; Groeseneken, Guido; Heremans, Paul

    2016-01-01

    We validate a model which is a combination of multiple trapping and release and percolation model for describing the conduction mechanism in amorphous indium gallium zinc oxide (a-IGZO) thin film transistors (TFT). We show that using just multiple trapping and release or percolation model is insufficient to explain TFT behavior as a function of temperature. We also show the intrinsic mobility is dependent on temperature due to scattering by ionic impurities or lattice. In solving the Poisson equation to find the surface potential and back potential as a function of gate voltage, we explicitly allow for the back surface to be floating, as is the case for a-IGZO transistors. The parameters for gap states, percolation barriers and intrinsic mobility at room temperature that we extract with this comprehensive model are in good agreement with those extracted in literature with partially-complete models.

  16. Experimental Investigation of Multipacting Suppression by amorphous Carbon Coatings

    CERN Document Server

    Holz, Michael

    The presence of electron cloud is considered as the most important limitation concerning the quality of the particle beam in the accelerators, especially with respect to the forthcoming LHC luminosity upgrade. The electron cloud can be mitigated by coating the vacuum beam chambers with thin films of low secondary electron yield (SEY). This technique is applied to two stand-alone main bending dipoles of the SPS, where the RF power is fed through a tungsten wire, stretched inside the vacuum chamber. A dipole with a bare stainless steel chamber shows a clear power threshold initiating an abrupt rise in reflected power and pressure. The effect is enhanced at RF frequencies corresponding to electron cyclotron resonances for given magnetic fields. The first results of a fully coated beam chamber do not exhibit any pressure rise or reflected RF power up to the maximum available input power. Here, reflected power has been observed only once and could not be reproduced. The results of a partially coated beam chamber s...

  17. Low temperature crystallization of diamond-like carbon films to graphene

    Energy Technology Data Exchange (ETDEWEB)

    Tinchev, Savcho, E-mail: stinchev@ie.bas.bg [Institute of Electronics, Bulgarian Academy of Sciences, Tzarigradsko Chaussee 72, 1784 Sofia (Bulgaria); Valcheva, Evgenia [Physics Department, Sofia University, J. Bourchier 5, 1164 Sofia (Bulgaria); Petrova, Elitza [Institute of Electronics, Bulgarian Academy of Sciences, Tzarigradsko Chaussee 72, 1784 Sofia (Bulgaria)

    2013-09-01

    Plasma surface modification was used to fabricate graphene on the top of insulating diamond-like carbon films. It is shown that by a combination of pulsed argon plasma treatment and thermal annealing at 350{sup o}C it is possible to achieve crystallization of amorphous carbon to graphene. The observed Raman spectra are typical for defected graphene-splitted D- and G-peaks and a broad 2D-peak. Because interpretation of Raman spectra of such complicated system is not easy we have calculated Raman signals of graphene on an amorphous hydrogenated carbon film deposited on a Si substrate. Our simulation results show that multiple reflections and interference effects lead to enhancement of Raman signal of the system. The characteristic for graphene G and 2D bands reach maximal enhancement for thicknesses of the amorphous hydrogenated carbon film of about 75 nm and 230 nm. We estimate that the interference enhancement of the 2D graphene Raman signal is very weak in contrast to that of the G band signal simulated for the underlying diamond-like carbon films on silicon substrate only. Therefore experimentally measured Raman spectra of the whole graphene/a-C:H/Si system probably will consist of interference enhanced but still weak 2D graphene peak and stronger D and G peaks dominated by G and D Raman bands of the a-C:H. This conclusion is in line with observed experimental Raman spectra. Electrical field effect measurements of the samples show ambipolar dependence, typical for single-layer graphene.

  18. Carbon Nanotube Thin-Film Antennas.

    Science.gov (United States)

    Puchades, Ivan; Rossi, Jamie E; Cress, Cory D; Naglich, Eric; Landi, Brian J

    2016-08-17

    Multiwalled carbon nanotube (MWCNT) and single-walled carbon nanotube (SWCNT) dipole antennas have been successfully designed, fabricated, and tested. Antennas of varying lengths were fabricated using flexible bulk MWCNT sheet material and evaluated to confirm the validity of a full-wave antenna design equation. The ∼20× improvement in electrical conductivity provided by chemically doped SWCNT thin films over MWCNT sheets presents an opportunity for the fabrication of thin-film antennas, leading to potentially simplified system integration and optical transparency. The resonance characteristics of a fabricated chlorosulfonic acid-doped SWCNT thin-film antenna demonstrate the feasibility of the technology and indicate that when the sheet resistance of the thin film is >40 ohm/sq no power is absorbed by the antenna and that a sheet resistance of antenna. The dependence of the return loss performance on the SWCNT sheet resistance is consistent with unbalanced metal, metal oxide, and other CNT-based thin-film antennas, and it provides a framework for which other thin-film antennas can be designed.

  19. Raman spectra of nitrogen-doped tetrahedral amorphous carbon from first principles

    Institute of Scientific and Technical Information of China (English)

    NIU Li; ZHU JiaQi; GAO Wei; HAN Xiao; DU ShanYi

    2009-01-01

    The non-resonant vibrational Raman spectra of nitrogen-doped tetrahedral amorphous carbon have been calculated from first principles, including the generation of s structural model, and the calculation of vibrational frequencies, vibrational eigenmodes and Raman coupling tensors. The calculated Raman spectra are in good agreement with the experimental results. The broad band at around 500 cm~(-1) arises from mixed bonds. The T peak originates from the vibrations of sp~3 carbon and the G peak comes from the stretching vibrations of sp~2-type bonding of C=C and C=N. The simulation results indicate the direct contribution of N vibrations to Raman spectra.

  20. Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Wenjie Sheng

    2016-06-01

    Full Text Available High-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm, where N2 = 0, 4, and 8 sccm. All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy films (N2 = 4, 8 sccm exhibit a face-centered cubic (FCC structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2 flow rate is increased. Both films could be potential candidates for protective coatings at high temperature.

  1. Baseline Evaluation of Thin-Film Amorphous Silicon, Copper Indium Diselenide, and Cadmium Telluride for the 21st Century: Preprint

    International Nuclear Information System (INIS)

    This paper examines three thin-film PV technologies: amorphous silicon, cadmium telluride, and copper indium selenide. The purpose is to: (1) assess their status and potential; (2) provide an improved set of criteria for comparing these existing thin films against any new PV technological alternatives, and examining the longer-term (c. 2050) potential of thin films to meet cost goals that would be competitive with conventional sources of energy without any added value from the substantial environmental advantages of PV. Among the conclusions are: (1) today's thin films have substantial economic potential, (2) any new approach to PV should be examined against the substantial achievements and potential of today's thin films, (3) the science and technology base of today's thin films needs substantial strengthening, (4) some need for alternative technologies exists, especially as the future PV marketplace expands beyond about 30 GW of annual production

  2. Advantages of using amorphous indium zinc oxide films for window layer in Cu(In,Ga)Se2 solar cells

    International Nuclear Information System (INIS)

    The advantages of using indium zinc oxide (IZO) films instead of conventional Ga-doped zinc oxide (ZnO:Ga) films for Cu(In,Ga)Se2 (CIGS) solar cells are described. The electrical properties of IZO are independent of film thickness. IZO films have higher mobility (30–40 cm2/Vs) and lower resistivity (4–5 × 10−4 Ω cm) compared to ZnO:Ga films deposited without intentional heating, because the number of grain boundaries in amorphous IZO films is small. The properties of a CIGS solar cell using IZO at the window layer were better than those obtained using a conventional ZnO:Ga at the window layer; moreover, the properties tended to be independent of thickness. These results indicate that use of IZO as a transparent conducting oxide layer is expected to increase the efficiency of CIGS solar cells.

  3. Effect of a Cr Underlayer on the Magnetic Properties of TbCo Amorphous Films with Perpendicular Anisotropy

    Institute of Scientific and Technical Information of China (English)

    黄致新; 李佐宜; 晋芳; 程晓敏; 许小红; 李震; 王鲜然; 林更琪

    2002-01-01

    The effect of the Cr underlayer on the magnetic properties of TbCo amorphous films with perpendicular anisotropyhas been investigated. It was found that the Cr underlayer thickness can influence the coercivity of TbCo films.A coercivity as high as 6.3kOe was obtained in 120nm Tb31Co69 films with a 180nm Cr underlayer. This wasonly 4.4 kOe for the same thickness Tb31 Co69 films without the Cr underlayer. Cross-sectional scanning electronmicroscopy indicated that the TbCo film with the Cr underlayer consisted ora column structure. It is consideredthat this heterogeneous structure gives rise to the coercivity enhancement of TbCo films in the presence of theCr underlayer.

  4. Solid solution or amorphous phase formation in TiZr-based ternary to quinternary multi-principal-element films

    Institute of Scientific and Technical Information of China (English)

    Mariana Braic; Viorel Braic; Alina Vladescu; Catalin N. Zoita; Mihai Balaceanu

    2014-01-01

    TiZr-based multicomponent metallic films composed of 3-5 constituents with almost equal atomic concentrations were prepared by co-sputtering of pure metallic targets in an Ar atmosphere. X-ray diffraction was employed to determine phase composition, crystalline structure, lattice parameters, texture and crystallite size of the deposited films. The deposited films exhibited only solid solution (fcc, bcc or hcp) or amorphous phases, no intermetallic components being detected. It was found that the hcp structure was stabilized by the presence of Hf or Y, bcc by Nb or Al and fcc by Cu. For the investigated films, the atomic size difference, mixing enthalpy, mixing entropy, Gibbs free energy of mixing and the electronegativity difference for solid solution and amorphous phases were calculated based on Miedema's approach of the regular solution model. It was shown that the atomic size difference and the ratio between the Gibbs free energies of mixing of the solid solution and amorphous phases were the most significant parameters controlling the film crystallinity.

  5. Pulsed laser deposition of thin carbon films in a neutral gas background

    International Nuclear Information System (INIS)

    We studied carbon film deposition using a laser-produced plasma, in argon and helium background gas, at pressures between 0.5 and 700 mTorr. A Nd : YAG, 370 mJ, 3.5 ns, at 1.06 µm, operating at 10 Hz, with a fluence of 6.7 J cm−2 was used. The laser plasma was characterized using space resolved OES and a fast response Faraday cup. The resulting carbon films were analysed using AFM, Raman spectroscopy, XPS and SIMS. The structural properties of the carbon films were found to be strongly correlated with the laser carbon plasma composition. Films with a relatively high content of sp3, characteristic of DLC, were obtained at pressures below 200 mTorr. For these conditions the characteristic carbon ion energies in the expanding laser plasma were of the order of 100 eV. At higher pressures sp2 bonds, associated with amorphous carbon, were dominant, which coincides with a high content of C2 molecules in the laser plasma, and a characteristic carbon ion energy around 20 eV. (paper)

  6. Effect of Si additions on thermal stability and the phase transition sequence of sputtered amorphous alumina thin films

    Energy Technology Data Exchange (ETDEWEB)

    Bolvardi, H.; Baben, M. to; Nahif, F.; Music, D., E-mail: music@mch.rwth-aachen.de; Schnabel, V.; Shaha, K. P.; Mráz, S.; Schneider, J. M. [Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Bednarcik, J.; Michalikova, J. [Deutsches Elektronen Synchrotron DESY, FS-PE group, Notkestrasse 85, D-22607 Hamburg (Germany)

    2015-01-14

    Si-alloyed amorphous alumina coatings having a silicon concentration of 0 to 2.7 at. % were deposited by combinatorial reactive pulsed DC magnetron sputtering of Al and Al-Si (90-10 at. %) split segments in Ar/O{sub 2} atmosphere. The effect of Si alloying on thermal stability of the as-deposited amorphous alumina thin films and the phase formation sequence was evaluated by using differential scanning calorimetry and X-ray diffraction. The thermal stability window of the amorphous phase containing 2.7 at. % of Si was increased by more than 100 °C compared to that of the unalloyed phase. A similar retarding effect of Si alloying was also observed for the α-Al{sub 2}O{sub 3} formation temperature, which increased by more than 120 °C. While for the latter retardation, the evidence for the presence of SiO{sub 2} at the grain boundaries was presented previously, this obviously cannot explain the stability enhancement reported here for the amorphous phase. Based on density functional theory molecular dynamics simulations and synchrotron X-ray diffraction experiments for amorphous Al{sub 2}O{sub 3} with and without Si incorporation, we suggest that the experimentally identified enhanced thermal stability of amorphous alumina with addition of Si is due to the formation of shorter and stronger Si–O bonds as compared to Al–O bonds.

  7. Microstructural study of oxidation of carbon-rich amorphous boron carbide coating

    Institute of Scientific and Technical Information of China (English)

    Bin ZENG; Zu-de FENG; Si-wei LI; Yong-sheng LIU

    2008-01-01

    Carbon-rich amorphous boron carbide (BxC) coatings were annealed at 400℃, 700℃, 1000℃ and 1200℃ for 2 h in air atmosphere. The microstructure and composition of the as-deposited and annealed coat-ings were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), micro-Raman spectro-scopy and energy dispersive X-ray spectroscopy (EDS). All of the post-anneal characterizations demonstrated the ability of carbon-rich BxC coatings to protect the graphite substrate against oxidation. Different oxidation modes of the coatings were found at low temperature (400℃), moderate temperature (700℃) and high temper-ature (1000℃ and 1200℃). Finally, the feasibility of the application of carbon-rich BxC instead of pyrolytic car-bon (PyC) as a fiber/matrix interlayer in ceramics-matrix composites (CMCs) is discussed here.

  8. Effective Route to Graphitic carbon Nitride from Ball-Milled Amorphous carbon in NH3 Atmosphere Under Annealing

    Institute of Scientific and Technical Information of China (English)

    费振义; 刘玉先

    2003-01-01

    Graphitic carbon nitride (g-C3N4) powders were successfully synthesized from ball-milled amorphous carbon under NHs atmosphere at high temperature, for the first time to the best of our knowledge. The combined characteristic data obtained by x-ray diffraction, high-resolution transmission-electron microscopy, electron energy loss spectroscopy, Raman spectroscopy, energy dispersive spectroscopic analysis, and Fourier transformation infrared spectroscopy provide substantial evidence for the graphite-like sp2-bonded structure with C3N4 stoichiometry.

  9. EBSD analysis of polysilicon films formed by aluminium induced crystallization of amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Tuezuen, O. [InESS, UMR 7163 CNRS-ULP, 23 rue du Loess, F-67037 Strasbourg Cedex 2 (France)], E-mail: Ozge.Tuzun@iness.c-strasbourg.fr; Auger, J.M. [InESS, UMR 7163 CNRS-ULP, 23 rue du Loess, F-67037 Strasbourg Cedex 2 (France); SMS Centre, UMR CNRS 5146, Ecole des Mines de Saint Etienne, 158 Cours Fauriel, 42023 Saint Etienne Cedex 2 (France); Gordon, I. [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium); Focsa, A.; Montgomery, P.C. [InESS, UMR 7163 CNRS-ULP, 23 rue du Loess, F-67037 Strasbourg Cedex 2 (France); Maurice, C. [SMS Centre, UMR CNRS 5146, Ecole des Mines de Saint Etienne, 158 Cours Fauriel, 42023 Saint Etienne Cedex 2 (France); Slaoui, A. [InESS, UMR 7163 CNRS-ULP, 23 rue du Loess, F-67037 Strasbourg Cedex 2 (France); Beaucarne, G.; Poortmans, J. [IMEC, Kapeldreef 75, B-3001 Leuven (Belgium)

    2008-08-30

    Among the methods for enlarging the grain size of polycrystalline silicon (poly-Si) thin films, aluminium induced crystallization (AIC) of amorphous silicon is considered to be a very promising approach. In the AIC process, a thin a-Si layer on top of an aluminium layer crystallizes at temperatures well below the eutectic temperature of the Al/Si system (T{sub eu} = 577 deg. C). By means of electron backscattering diffraction (EBSD), we have mainly studied the effect of the aluminium layer quality varying the deposition system on the grain size, the defects and the preferential crystallographic orientation. We have found a strong correlation between the mean grain size and the size distribution with the Al deposition system and the surface quality. Furthermore, we show for the first time that more than 50% of the surface of the AIC films grown on alumina substrates are (103) preferentially oriented, instead of the commonly observed (100) preferential orientation. This may have important consequences for epitaxial thickening of the AIC layer into polysilicon absorber layers for solar cells.

  10. Water-soluble thin film transistors and circuits based on amorphous indium-gallium-zinc oxide.

    Science.gov (United States)

    Jin, Sung Hun; Kang, Seung-Kyun; Cho, In-Tak; Han, Sang Youn; Chung, Ha Uk; Lee, Dong Joon; Shin, Jongmin; Baek, Geun Woo; Kim, Tae-il; Lee, Jong-Ho; Rogers, John A

    2015-04-22

    This paper presents device designs, circuit demonstrations, and dissolution kinetics for amorphous indium-gallium-zinc oxide (a-IGZO) thin film transistors (TFTs) comprised completely of water-soluble materials, including SiNx, SiOx, molybdenum, and poly(vinyl alcohol) (PVA). Collections of these types of physically transient a-IGZO TFTs and 5-stage ring oscillators (ROs), constructed with them, show field effect mobilities (∼10 cm2/Vs), on/off ratios (∼2×10(6)), subthreshold slopes (∼220 mV/dec), Ohmic contact properties, and oscillation frequency of 5.67 kHz at supply voltages of 19 V, all comparable to otherwise similar devices constructed in conventional ways with standard, nontransient materials. Studies of dissolution kinetics for a-IGZO films in deionized water, bovine serum, and phosphate buffer saline solution provide data of relevance for the potential use of these materials and this technology in temporary biomedical implants. PMID:25805699

  11. Electrochemical behavior of gold nanoparticles modified nitrogen incorporated tetrahedral amorphous carbon and its application in glucose sensing.

    Science.gov (United States)

    Liu, Aiping; Wu, Huaping; Qiu, Xu; Tang, Weihua

    2011-12-01

    Gold nanoparticles (NPs) with 10-50 nm in diameter were synthesized on nitrogen incorporated tetrahedral amorphous carbon (ta-C:N) thin film electrode by electrodeposition. The deposition and nucleation processes of Au on ta-C:N surface were investigated by cyclic voltammetry and chronoamperometry. The morphology of Au NPs was characterized by scanned electron microscopy. The electrochemical properties of Au NPs modified ta-C:N (ta-C:N/Au) electrode and its ability to sense glucose were investigated by voltammetric and amperometric measurements. The potentiostatic current-time transients showed a progressive nucleation process and diffusion growth of Au on the surface of ta-C:N film according to the Scharifker-Hills model. The Au NPs acted as microelectrodes improved the electron transfer and electrocatalytic oxidation of glucose on ta-C:N electrode. The ta-C:N/Au electrode exhibited fast current response, a linear detection range of glucose from 0.5 to 25 mM and a detection limit of 120 microM, which hinted its potential application as a glucose biosensor. PMID:22409057

  12. Microstructure factor and mechanical and electronic properties of hydrogenated amorphous and nanocrystalline silicon thin-films for microelectromechanical systems applications

    Energy Technology Data Exchange (ETDEWEB)

    Mouro, J.; Gualdino, A.; Chu, V. [Instituto de Engenharia de Sistemas e Computadores – Microsistemas e Nanotecnologias (INESC-MN) and IN – Institute of Nanoscience and Nanotechnology, 1000-029 Lisbon (Portugal); Conde, J. P. [Instituto de Engenharia de Sistemas e Computadores – Microsistemas e Nanotecnologias (INESC-MN) and IN – Institute of Nanoscience and Nanotechnology, 1000-029 Lisbon (Portugal); Department of Bioengineering, Instituto Superior Técnico (IST), 1049-001 Lisbon (Portugal)

    2013-11-14

    Thin-film silicon allows the fabrication of MEMS devices at low processing temperatures, compatible with monolithic integration in advanced electronic circuits, on large-area, low-cost, and flexible substrates. The most relevant thin-film properties for applications as MEMS structural layers are the deposition rate, electrical conductivity, and mechanical stress. In this work, n{sup +}-type doped hydrogenated amorphous and nanocrystalline silicon thin-films were deposited by RF-PECVD, and the influence of the hydrogen dilution in the reactive mixture, the RF-power coupled to the plasma, the substrate temperature, and the deposition pressure on the structural, electrical, and mechanical properties of the films was studied. Three different types of silicon films were identified, corresponding to three internal structures: (i) porous amorphous silicon, deposited at high rates and presenting tensile mechanical stress and low electrical conductivity, (ii) dense amorphous silicon, deposited at intermediate rates and presenting compressive mechanical stress and higher values of electrical conductivity, and (iii) nanocrystalline silicon, deposited at very low rates and presenting the highest compressive mechanical stress and electrical conductivity. These results show the combinations of electromechanical material properties available in silicon thin-films and thus allow the optimized selection of a thin silicon film for a given MEMS application. Four representative silicon thin-films were chosen to be used as structural material of electrostatically actuated MEMS microresonators fabricated by surface micromachining. The effect of the mechanical stress of the structural layer was observed to have a great impact on the device resonance frequency, quality factor, and actuation force.

  13. Erosion of thin hydrogenated carbon films in oxygen, oxygen/hydrogen and water plasmas

    International Nuclear Information System (INIS)

    The erosion of amorphous hydrogenated carbon films in oxygen, oxygen/hydrogen and water electron cyclotron resonance plasmas was investigated by in situ ellipsometry. The erosion was measured as a function of the energy of the impinging ions and the substrate temperature. Erosion is most effective in pure oxygen plasmas. The erosion rate rises with increasing ion energy and substrate temperature, in the latter case however only at low ion energies. The reaction layer at the surface of the eroded film is further analyzed by X-ray photoelectron spectroscopy (XPS). The C ls peak of the XPS spectra shows, that oxygen is implanted in the films and forms double and single bonds to the carbon atoms. This modification, however, is limited to a few atomic layers. (orig.)

  14. Tribological properties of ion beam deposited diamond-like carbon film on silicon nitride

    International Nuclear Information System (INIS)

    The present article reports on the physical characterization and tribological properties of diamond-like carbon (DLC) films deposited on structural Si3N4 substrates. The films were deposited by the direct ion beam deposition technique. The ion beam was produced by plasma discharge of pre-mixed methane and hydrogen gas in a Kaufman-type ion source. The deposited films were found to be amorphous and contained about 70% carbon and 30% hydrogen. The friction coefficient of an uncoated Si3N4 ball on a DLC coated Si3N4 disc starts at about 0.2, then decreases rapidly to 0.1-0.15 with increasing sliding distance. Increasing humidity results in a slight increase in friction coefficient, but a significant decrease in wear factor. The wear factor for the tests at ≅60% rh (relative humidity) are about an order of magnitude smaller than the tests at 3% rh. (orig.)

  15. Surface morphology stabilization by chemical sputtering in carbon nitride film growth

    Energy Technology Data Exchange (ETDEWEB)

    Buijnsters, J G [Institute for Molecules and Materials (IMM), Radboud University Nijmegen, Toernooiveld 1, 6525 ED Nijmegen (Netherlands); Vazquez, L [Instituto de Ciencia de Materiales de Madrid (CSIC), C/Sor Juana Ines de la Cruz 3, 28049 Madrid (Spain)

    2008-01-07

    We have studied the influence of chemical sputtering effects on the morphology of carbon nitride films grown on silicon substrates by electron cyclotron resonance chemical vapour deposition. This study has been performed by comparing the evolution of their morphology with that of hydrogenated amorphous carbon films grown under similar conditions, where these effects are not present. When chemical sputtering effects operate we observe a film surface stabilization for length scales in the 60-750 nm range after a threshold roughness of about 3-4 nm has been developed. This stabilization is explained on the basis of the re-emission of nitrogen etching species, which is confirmed by growth experiments on microstructured substrates. (fast track communication)

  16. Cell survival in carbon beams - comparison of amorphous track model predictions

    DEFF Research Database (Denmark)

    Grzanka, L.; Greilich, S.; Korcyl, M.;

    Introduction: Predictions of the radiobiological effectiveness (RBE) play an essential role in treatment planning with heavy charged particles. Amorphous track models ( [1] , [2] , also referred to as track structure models) provide currently the most suitable description of cell survival under ion...... distribution models, and gamma response models was developed. This software can be used for direct numerical comparison between the models, submodels and their parameters and experimental data. In the present paper, we look at 10%-survival data from cell lines irradiated in vitro with carbon and proton beams...... irradiation. The aim of this paper is to compare the predictions from different amorphous approaches found in the literature - more specifically the phenomenological, analytical model by Katz and co-workers [1] and a Monte-Carlo based full as implemented for example in the local effect model by Scholz et al...

  17. Amorphous calcium carbonate precipitation by cellular biomineralization in mantle cell cultures of Pinctada fucata.

    Directory of Open Access Journals (Sweden)

    Liang Xiang

    Full Text Available The growth of molluscan shell crystals is generally thought to be initiated from the extrapallial fluid by matrix proteins, however, the cellular mechanisms of shell formation pathway remain unknown. Here, we first report amorphous calcium carbonate (ACC precipitation by cellular biomineralization in primary mantle cell cultures of Pinctada fucata. Through real-time PCR and western blot analyses, we demonstrate that mantle cells retain the ability to synthesize and secrete ACCBP, Pif80 and nacrein in vitro. In addition, the cells also maintained high levels of alkaline phosphatase and carbonic anhydrase activity, enzymes responsible for shell formation. On the basis of polarized light microscopy and scanning electron microscopy, we observed intracellular crystals production by mantle cells in vitro. Fourier transform infrared spectroscopy and X-ray diffraction analyses revealed the crystals to be ACC, and de novo biomineralization was confirmed by following the incorporation of Sr into calcium carbonate. Our results demonstrate the ability of mantle cells to perform fundamental biomineralization processes via amorphous calcium carbonate, and these cells may be directly involved in pearl oyster shell formation.

  18. The ir emission features: Emission from PAH [Polycyclic Aromatic Hydrocarbons] molecules and amorphous carbon particles

    International Nuclear Information System (INIS)

    PAHs can have several forms in the interstellar medium. To assess the importance of each requires the availability of a collection of high quality, complete mid-ir interstellar emission spectra, a collection of laboratory spectra of PAH samples prepared under realistic conditions and a firm understanding of the microscopic emission mechanism. Given what we currently know about PAHs, the spectroscopic data suggests that there are at least two components which contribute to the interstellar emission spectrum: free molecule sized PAHs producing the narrow features and amorphous carbon particles (which are primarily made up of an irregular ''lattice'' of PAHs) contributing to the broad underlying components. An exact treatment of the ir fluorescence from highly vibrationally excited large molecules shows that species containing between 20 and 30 carbon atoms are responsible for the narrow features, although the spectra match more closely with the spectra of amorphous carbon particles. Since little is known about the spectroscopic properties of free PAHs and PAH clusters, much laboratory work is called for in conjunction with an observational program which focuses on the spatial characteristics of the spectra. In this way the distribution and evolution of carbon from molecule to particle can be traced. 38 refs., 9 figs

  19. Crystalline and Amorphous Phosphorus – Carbon Nanotube Composites as Promising Anodes for Lithium-Ion Batteries

    KAUST Repository

    Smajic, Jasmin

    2016-05-04

    Battery research has been going full steam and with that the search for alternative anodes. Among many proposed electrode materials, little attention has been given to phosphorus. Phosphorus boasts the third highest gravimetric charge capacity and the highest volumetric charge capacity of all elements. Because of that, it would be an attractive battery anode material were it not for its poor cyclability with significant capacity loss immediately after the first cycle. This is known to be the consequence of considerable volume changes of phosphorus during charge/discharge cycles. In this work, we propose circumventing this issue by mixing amorphous red phosphorus with carbon nanotubes. By employing a non-destructive sublimation-deposition method, we have synthesized composites where the synergetic effect between phosphorus and carbon nanotubes allow for an improvement in the electrochemical performance of battery anodes. In fact, it has been shown that carbon nanotubes can act as an effective buffer to phosphorus volumetric expansions and contractions during charging and discharging of the half-cells [1]. By modifying the synthesis parameters, we have also been able to change the degree of crystallinity of the phosphorus matrix in the composites. In fact, the less common phase of red phosphorus, named fibrous phosphorus, was obtained, and that explains some of the varying electrochemical performances observed in the composites. Overall, it is found that a higher surface area of amorphous phosphorus allows for a better anode material when using single-walled carbon nanotubes as fillers.

  20. High-energy ion treatments of amorphous As40Se60 thin films for optical applications

    Institute of Scientific and Technical Information of China (English)

    Rashmi Chauhan; Arvind Tripathi; Krishna Kant Srivastava

    2014-01-01

    The treatment of 100 MeV Ag swift-heavy ion (SHI) irradiation with five different fluences (3 ? 1010, 1 ? 1011, 3 ? 1011, 1 ? 1012, and 3 ? 1012 ions/cm2) was used to design optical and structural properties of amorphous (a-) As40Se60 chalcogenide thin films. Swanepoel method was applied on transmission measurements to determine the changes in optical bandgap, Tauc parameter and linear optical parameters, i.e., linear optical absorption, extinction coefficient and linear refractive index. Dispersion of the material was determined by Wemple-DiDomenico relation. Changes in nonlinear optical parameters of third-order optical susceptibility and nonlinear refractive index were determined using semi-empirical relations. Changes in surface morphology of the films were investigated using SEM observation, which indicated that fluence 3 ? 1012 ions/cm2 was upper threshold limit for these films for ion treatment. It is observed that optical bandgap reduces from 1.76 eV to 1.64 eV, and nonlinear refractive index increases from 1.31 ? 10 ? 10 [esu] to 1.74 ? 10 ? 10 [esu]. Linear refractive index initially increases from 2.80 to 3.52 (for fluence 3 ? 1010 ions/cm2) and then keeps decreasing. The observed changes in optical properties upon irradiation were explained in terms of structural rearrangements by Raman measurement. The study was compiled with the previous literature to propose SHI as an effective optical engineering technique to achieve desired changes according to the need of optical/photonic applications.

  1. High-energy ion treatments of amorphous As40Se60 thin films for optical applications

    Directory of Open Access Journals (Sweden)

    Rashmi Chauhan

    2014-06-01

    Full Text Available The treatment of 100 MeV Ag swift-heavy ion (SHI irradiation with five different fluences (3×1010, 1×1011, 3×1011, 1×1012, and 3×1012 ions/cm2 was used to design optical and structural properties of amorphous (a- As40Se60 chalcogenide thin films. Swanepoel method was applied on transmission measurements to determine the changes in optical bandgap, Tauc parameter and linear optical parameters, i.e., linear optical absorption, extinction coefficient and linear refractive index. Dispersion of the material was determined by Wemple–DiDomenico relation. Changes in nonlinear optical parameters of third-order optical susceptibility and nonlinear refractive index were determined using semi-empirical relations. Changes in surface morphology of the films were investigated using SEM observation, which indicated that fluence 3×1012 ions/cm2 was upper threshold limit for these films for ion treatment. It is observed that optical bandgap reduces from 1.76 eV to 1.64 eV, and nonlinear refractive index increases from 1.31×10−10 [esu] to 1.74×10−10 [esu]. Linear refractive index initially increases from 2.80 to 3.52 (for fluence 3×1010 ions/cm2 and then keeps decreasing. The observed changes in optical properties upon irradiation were explained in terms of structural rearrangements by Raman measurement. The study was compiled with the previous literature to propose SHI as an effective optical engineering technique to achieve desired changes according to the need of optical/photonic applications.

  2. First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films

    International Nuclear Information System (INIS)

    Progress has recently been made in developing reactive force fields to describe chemical reactions in systems too large for quantum mechanical (QM) methods. In particular, ReaxFF, a force field with parameters that are obtained solely from fitting QM reaction data, has been used to predict structures and properties of many materials. Important applications require, however, determination of the final structures produced by such complex processes as chemical vapor deposition, atomic layer deposition, and formation of ceramic films by pyrolysis of polymers. This requires the force field to properly describe the formation of other products of the process, in addition to yielding the final structure of the material. We describe a strategy for accomplishing this and present an example of its use for forming amorphous SiC films that have a wide variety of applications. Extensive reactive molecular dynamics (MD) simulations have been carried out to simulate the pyrolysis of hydridopolycarbosilane. The reaction products all agree with the experimental data. After removing the reaction products, the system is cooled down to room temperature at which it produces amorphous SiC film, for which the computed radial distribution function, x-ray diffraction pattern, and the equation of state describing the three main SiC polytypes agree with the data and with the QM calculations. Extensive MD simulations have also been carried out to compute other structural properties, as well the effective diffusivities of light gases in the amorphous SiC film

  3. Study on the Crystallization of Amorphous Cr-Si-Ni Thin Films Using in situ X-ray Diffraction

    Institute of Scientific and Technical Information of China (English)

    Xianping DONG; Jiansheng WU

    2001-01-01

    Crystallization behavior of amorphous Cr-Si-Ni thin films was investigated by means of high temperature in situ X-ray diffraction measurements. The diffraction spectra were recorded isothermally at temperature between 250 and 750℃. The in situ testing of crystallization enables the direct observation of structure evolution which is dependent on heat treatment.Based on the testing results, the grain sizes of the crystalline phases were compared and phase transition tendency was understood. In the mean time, electrical properties of the films as functions of annealing temperature and time have been studied. The increase of volume fraction of CrSi2 crystallinc phases in the Cr-Si-Ni films leads to the decrease in conductivity of the films.The annealing behavior of temperature coefficient of resistance (TCR) is a result of competition between a negative contribution caused by the weak localization effects in amorphous region and a positive contribution caused by CrSi2 grains. Thus the proper mixture of amorphous and crystalline constituents could result in a final zero TCR.

  4. Dark conductivity and photoconductivity of amorphous Hg0.78Cd0.22Te thin films

    Institute of Scientific and Technical Information of China (English)

    Qiu Feng; Ji Rongbin; Xiang Jinzhong; Kong Jincheng; Yu Lianjie; Kong Lingde; Wang Guanghua; Li Xiongjun; Yang Lili; Li Cong

    2011-01-01

    This paper reports the dark conductivity and photoconductivity of amorphous Hg0.78Cd0.22 Te thin films deposited on an Al2O3 substrate by RF magnetron sputtering.It is determined that dark conduction activation energy is 0.417 eV for the as-grown sample.Thermal quenching is absent for the as-grown sample during the testing temperature zone,but the reverse is true for the polycrystalline sample.Photosensitivity shows the maximum at 240 K for amorphous thin films,while it is higher for the as-grown sample than for polycrystalline thin films in the range from 170 to 300 K.The recombination mechanism is the monomolecular recombination process at room temperature,which is different from the low temperature range.Theμτ-product is low in the range of 10-11-10-9 cm2/V,which indicates that some defect states exist in the amorphous thin films.

  5. Element specific spin and orbital moments of nanoscale CoFeB amorphous thin films on GaAs(100

    Directory of Open Access Journals (Sweden)

    Yu Yan

    2016-09-01

    Full Text Available CoFeB amorphous films have been synthesized on GaAs(100 and studied with X-ray magnetic circular dichroism (XMCD and transmission electron microscopy (TEM. We have found that the ratios of the orbital to spin magnetic moments of both the Co and Fe in the ultrathin amorphous film have been enhanced by more than 300% compared with those of the bulk crystalline Co and Fe, and specifically a large orbital moment of 0.56 μB from the Co atoms has been observed and at the same time the spin moment of the Co atoms remains comparable to that of the bulk hcp Co. The results indicate that the large uniaxial magnetic anisotropy (UMA observed in the ultrathin CoFeB film on GaAs(100 is related to the enhanced spin-orbital coupling of the Co atoms in the CoFeB. This work offers experimental evidences of the correlation between the UMA and the element specific spin and orbital moments in the CoFeB amorphous film on the GaAs(100 substrate, which is of significance for spintronics applications.

  6. Present status of amorphous In–Ga–Zn–O thin-film transistors

    Directory of Open Access Journals (Sweden)

    Toshio Kamiya, Kenji Nomura and Hideo Hosono

    2010-01-01

    Full Text Available The present status and recent research results on amorphous oxide semiconductors (AOSs and their thin-film transistors (TFTs are reviewed. AOSs represented by amorphous In–Ga–Zn–O (a-IGZO are expected to be the channel material of TFTs in next-generation flat-panel displays because a-IGZO TFTs satisfy almost all the requirements for organic light-emitting-diode displays, large and fast liquid crystal and three-dimensional (3D displays, which cannot be satisfied using conventional silicon and organic TFTs. The major insights of this review are summarized as follows. (i Most device issues, such as uniformity, long-term stability against bias stress and TFT performance, are solved for a-IGZO TFTs. (ii A sixth-generation (6G process is demonstrated for 32'' and 37'' displays. (iii An 8G sputtering apparatus and a sputtering target have been developed. (iv The important effect of deep subgap states on illumination instability is revealed. (v Illumination instability under negative bias has been intensively studied, and some mechanisms are proposed. (vi Degradation mechanisms are classified into back-channel effects, the creation of traps at an interface and in the gate insulator, and the creation of donor states in annealed a-IGZO TFTs by the Joule heating; the creation of bulk defects should also be considered in the case of unannealed a-IGZO TFTs. (vii Dense passivation layers improve the stability and photoresponse and are necessary for practical applications. (viii Sufficient knowledge of electronic structures and electron transport in a-IGZO has been accumulated to construct device simulation models.

  7. Amorphous Ultrathin SnO2 Films by Atomic Layer Deposition on Graphene Network as Highly Stable Anodes for Lithium-Ion Batteries.

    Science.gov (United States)

    Xie, Ming; Sun, Xiang; George, Steven M; Zhou, Changgong; Lian, Jie; Zhou, Yun

    2015-12-23

    Amorphous SnO2 (a-SnO2) thin films were conformally coated onto the surface of reduced graphene oxide (G) using atomic layer deposition (ALD). The electrochemical characteristics of the a-SnO2/G nanocomposites were then determined using cyclic voltammetry and galvanostatic charge/discharge curves. Because the SnO2 ALD films were ultrathin and amorphous, the impact of the large volume expansion of SnO2 upon cycling was greatly reduced. With as few as five formation cycles best reported in the literature, a-SnO2/G nanocomposites reached stable capacities of 800 mAh g(-1) at 100 mA g(-1) and 450 mAh g(-1) at 1000 mA g(-1). The capacity from a-SnO2 is higher than the bulk theoretical values. The extra capacity is attributed to additional interfacial charge storage resulting from the high surface area of the a-SnO2/G nanocomposites. These results demonstrate that metal oxide ALD on high surface area conducting carbon substrates can be used to fabricate high power and high capacity electrode materials for lithium-ion batteries.

  8. Superconductive niobium films coating carbon nanotube fibers

    Science.gov (United States)

    Salvato, M.; Lucci, M.; Ottaviani, I.; Cirillo, M.; Behabtu, N.; Young, C. C.; Pasquali, M.; Vecchione, A.; Fittipaldi, R.; Corato, V.

    2014-11-01

    Superconducting niobium (Nb) has been successfully obtained by sputter deposition on carbon nanotube fibers. The transport properties of the niobium coating the fibers are compared to those of niobium thin films deposited on oxidized Si substrates during the same deposition run. For niobium films with thicknesses above 300 nm, the niobium coating the fibers and the thin films show similar normal state and superconducting properties with critical current density, measured at T = 4.2 K, of the order of 105 A cm-2. Thinner niobium layers coating the fibers also show the onset of the superconducting transition in the resistivity versus temperature dependence, but zero resistance is not observed down to T = 1 K. We evidence by scanning electron microscopy (SEM) and current-voltage measurements that the granular structure of the samples is the main reason for the lack of true global superconductivity for thicknesses below 300 nm.

  9. Superconductive niobium films coating carbon nanotube fibers

    International Nuclear Information System (INIS)

    Superconducting niobium (Nb) has been successfully obtained by sputter deposition on carbon nanotube fibers. The transport properties of the niobium coating the fibers are compared to those of niobium thin films deposited on oxidized Si substrates during the same deposition run. For niobium films with thicknesses above 300 nm, the niobium coating the fibers and the thin films show similar normal state and superconducting properties with critical current density, measured at T = 4.2 K, of the order of 105 A cm−2. Thinner niobium layers coating the fibers also show the onset of the superconducting transition in the resistivity versus temperature dependence, but zero resistance is not observed down to T = 1 K. We evidence by scanning electron microscopy (SEM) and current-voltage measurements that the granular structure of the samples is the main reason for the lack of true global superconductivity for thicknesses below 300 nm. (paper)

  10. Amorphous carbon nitride as an alternative electrode material in electroanalysis: Simultaneous determination of dopamine and ascorbic acid

    Energy Technology Data Exchange (ETDEWEB)

    Medeiros, Roberta A., E-mail: roantigo@hotmail.com [Departamento de Química, Universidade Federal de São Carlos, C.P. 676, 13560-970 São Carlos, SP (Brazil); Matos, Roberto [Departamento de Química, Universidade Federal de São Carlos, C.P. 676, 13560-970 São Carlos, SP (Brazil); Benchikh, Abdelkader [LECVE, Faculté de la Technologie, Département de Génie des Procédés, Université Abderrahmane MIRA, Béjaïa (Algeria); LISE UPR 15 du CNRS, Université Pierre et Marie Curie, 4, Place Jussieu, 75005 Paris (France); Saidani, Boualem [LECVE, Faculté de la Technologie, Département de Génie des Procédés, Université Abderrahmane MIRA, Béjaïa (Algeria); Debiemme-Chouvy, Catherine [LISE UPR 15 du CNRS, Université Pierre et Marie Curie, 4, Place Jussieu, 75005 Paris (France); Deslouis, Claude, E-mail: claude.deslouis@upmc.fr [LISE UPR 15 du CNRS, Université Pierre et Marie Curie, 4, Place Jussieu, 75005 Paris (France); Rocha-Filho, Romeu C.; Fatibello-Filho, Orlando [Departamento de Química, Universidade Federal de São Carlos, C.P. 676, 13560-970 São Carlos, SP (Brazil)

    2013-10-03

    Graphical abstract: -- Highlights: •a-CN{sub x} films are a new class of electrodic carbon materials that present several properties similar to those of BDD films. •a-CN{sub x} and BDD were used as working electrodes for simultaneous determination of DA and AA. •Electrochemical pretreatments on a-CN{sub x} or BDD modified the nature of the surface terminations. •An anodic pretreatment in 0.1 mol L{sup −1} KOH was necessary to attain an adequate separation of the DA and AA oxidation potential peaks. •For the first time in the literature, the use of an a-CN{sub x} electrode in a complete electroanalytical procedure is reported. -- Abstract: Boron-doped diamond (BDD) films are excellent electrode materials, whose electrochemical activity for some analytes can be tuned by controlling their surface termination, most commonly either to predominantly hydrogen or oxygen. This tuning can be accomplished by e.g. suitable cathodic or anodic electrochemical pretreatments. Recently, it has been shown that amorphous carbon nitride (a-CN{sub x}) films may present electrochemical characteristics similar to those of BDD, including the influence of surface termination on their electrochemical activity toward some analytes. In this work, we report for the first time a complete electroanalytical method using an a-CN{sub x} electrode. Thus, an a-CN{sub x} film deposited on a stainless steel foil by DC magnetron sputtering is proposed as an alternative electrode for the simultaneous determination of dopamine (DA) and ascorbic acid (AA) in synthetic biological samples by square-wave voltammetry. The obtained results are compared with those attained using a BDD electrode. For both electrodes, a same anodic pretreatment in 0.1 mol L{sup −1} KOH was necessary to attain an adequate and equivalent separation of the DA and AA oxidation potential peaks of about 330 mV. The detection limits obtained for the simultaneous determination of these analytes using the a-CN{sub x

  11. Effects of molybdenum doping and thermal annealing on the physical properties of amorphous In–Zn–O films

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Shiu-Jen, E-mail: sjliu@ntnu.edu.tw [Department of Mathematics and Science (Pre-college), National Taiwan Normal University, Linkou District, New Taipei City 244, Taiwan (China); Wu, Kuei-Ching [Department of Mathematics and Science (Pre-college), National Taiwan Normal University, Linkou District, New Taipei City 244, Taiwan (China); Peng, Kun-Cheng [Department of Materials Engineering, Mingchi University of Technology, Taishan District, New Taipei City 243, Taiwan (China)

    2015-06-15

    Highlights: • The effects of Mo doping and thermal annealing on a-IZO films were studied. • The carrier mobility of Mo-doped a-IZO films was enhanced by thermal annealing. • The optical bandgap of a-IZO films was unaffected by Mo doping. • Ferromagnetism was observed in Mo-doped a-IZO films after annealing. - Abstract: Amorphous In–Zn–O (a-IZO) films doped with Mo were prepared on glass substrates by using magnetron co-sputtering technique. The Mo concentration was controlled by varying the sputtering power applied on the Mo target. The effects of Mo doping and thermal annealing on the electrical, optical and magnetic properties of the a-IZO films were studied. The electrical properties of a-IZO films were found to be strongly affected by Mo doping and thermal annealing. The optical transmission near the absorption edge of a-IZO films is enhanced by Mo doping due to the decrease in reflection. The optical bandgap estimated to be 3.2 eV of a-IZO films is unaffected by Mo doping and thermal annealing. Moreover, some of Mo-doped films exhibit room-temperature ferromagnetism after annealing.

  12. An ab initio study of the nickel-catalyzed transformation of amorphous carbon into graphene in rapid thermal processing

    Science.gov (United States)

    Chen, Shuang; Xiong, Wei; Zhou, Yun Shen; Lu, Yong Feng; Zeng, Xiao Cheng

    2016-05-01

    Ab initio molecular dynamics (AIMD) simulations are employed to investigate the chemical mechanism underlying the Ni-catalyzed transformation of amorphous carbon (a-C) into graphene in the rapid thermal processing (RTP) experiment to directly grow graphene on various dielectric surfaces via the evaporation of surplus Ni and C at 1100 °C (below the melting point of bulk Ni). It is found that the a-C-to-graphene transformation entails the metal-induced crystallization and layer exchange mechanism, rather than the conventional dissolution/precipitation mechanism typically involved in Ni-catalyzed chemical vapor deposition (CVD) growth of graphene. The multi-layer graphene can be tuned by changing the relative thicknesses of deposited a-C and Ni thin films. Our AIMD simulations suggest that the easy evaporation of surplus Ni with excess C is likely attributed to the formation of a viscous-liquid-like Ni-C solution within the temperature range of 900-1800 K and to the faster diffusion of C atoms than that of Ni atoms above 600 K. Even at room temperature, sp3-C atoms in a-C are quickly converted to sp2-C atoms in the course of the simulation, and the graphitic C formation can occur at low temperature. When the temperature is as high as 1200 K, the grown graphitic structures reversely dissolve into Ni. Because the rate of temperature increase is considerably faster in the AIMD simulations than in realistic experiments, defects in the grown graphitic structures are kinetically trapped. In this kinetic growth stage, the carbon structures grown from sp3-carbon or from sp2-carbon exhibit marked differences.Ab initio molecular dynamics (AIMD) simulations are employed to investigate the chemical mechanism underlying the Ni-catalyzed transformation of amorphous carbon (a-C) into graphene in the rapid thermal processing (RTP) experiment to directly grow graphene on various dielectric surfaces via the evaporation of surplus Ni and C at 1100 °C (below the melting point of bulk

  13. X-ray diffraction study of atomic structure features of amorphous carbon containing materials of nature and synthetic origin

    International Nuclear Information System (INIS)

    The atomic structure of amorphous carbon-containing materials such as carbon glass, spectroscopically pure carbon, schungite and anthracite is investigated using X ray diffraction analysis and computerized simulation. In computerized simulation of model gratings packing into packets an interlayer distance and a number of layer in a packet varied and a gratings turn is predetermined randomly. The quantity of gratings in a packet is shown to vary between four for anthracite and six for spectroscopically pure coal. The interlayer distance for all amorphous carbonaceous materials is above 3.35 A which is typical for graphite

  14. An ab initio study of the nickel-catalyzed transformation of amorphous carbon into graphene in rapid thermal processing.

    Science.gov (United States)

    Chen, Shuang; Xiong, Wei; Zhou, Yun Shen; Lu, Yong Feng; Zeng, Xiao Cheng

    2016-05-14

    Ab initio molecular dynamics (AIMD) simulations are employed to investigate the chemical mechanism underlying the Ni-catalyzed transformation of amorphous carbon (a-C) into graphene in the rapid thermal processing (RTP) experiment to directly grow graphene on various dielectric surfaces via the evaporation of surplus Ni and C at 1100 °C (below the melting point of bulk Ni). It is found that the a-C-to-graphene transformation entails the metal-induced crystallization and layer exchange mechanism, rather than the conventional dissolution/precipitation mechanism typically involved in Ni-catalyzed chemical vapor deposition (CVD) growth of graphene. The multi-layer graphene can be tuned by changing the relative thicknesses of deposited a-C and Ni thin films. Our AIMD simulations suggest that the easy evaporation of surplus Ni with excess C is likely attributed to the formation of a viscous-liquid-like Ni-C solution within the temperature range of 900-1800 K and to the faster diffusion of C atoms than that of Ni atoms above 600 K. Even at room temperature, sp(3)-C atoms in a-C are quickly converted to sp(2)-C atoms in the course of the simulation, and the graphitic C formation can occur at low temperature. When the temperature is as high as 1200 K, the grown graphitic structures reversely dissolve into Ni. Because the rate of temperature increase is considerably faster in the AIMD simulations than in realistic experiments, defects in the grown graphitic structures are kinetically trapped. In this kinetic growth stage, the carbon structures grown from sp(3)-carbon or from sp(2)-carbon exhibit marked differences.

  15. An Amorphous Carbon Nitride Photocatalyst with Greatly Extended Visible-Light-Responsive Range for Photocatalytic Hydrogen Generation.

    Science.gov (United States)

    Kang, Yuyang; Yang, Yongqiang; Yin, Li-Chang; Kang, Xiangdong; Liu, Gang; Cheng, Hui-Ming

    2015-08-19

    Amorphous carbon nitride (ACN) with a bandgap of 1.90 eV shows an order of magnitude higher photocatalytic activity in hydrogen evolution under visible light than partially crystalline graphitic carbon nitride with a bandgap of 2.82 eV. ACN is photocatalytically active under visible light at a wavelength beyond 600 nm.

  16. The thickness dependence of the crystallization behavior in sandwiched amorphous Ge2Sb2Te5 thin films

    Science.gov (United States)

    Bai, G.; Li, R.; Xu, H. N.; Xia, Y. D.; Liu, Z. G.; Lu, H. M.; Yin, J.

    2011-12-01

    The thickness dependent crystallization behavior of thin amorphous Ge2Sb2Te5(GST) films sandwiched between different cladding materials has been investigated based on a thermodynamic model. It is revealed that there is a critical thickness below which the crystallization cannot occur. The critical thickness is determined by the energy difference Δγ between the crystalline GST/substrate interface energy and the amorphous GST/substrate interface energy, the melting enthalpy, and the mole volume. The calculated result is in good agreement with the experiments. Furthermore, the crystallization temperature is also affected by interface energy difference Δγ. Larger Δγ gives rise to a higher crystallization temperature, and vice versa. This impact becomes stronger as the film thickness is decreased.

  17. Heat treatment to prevent image defect occurrence in amorphous Se doped with Te avalanche multiplication photoconductive film

    Energy Technology Data Exchange (ETDEWEB)

    Ohkawa, Yuji; Matsubara, Tomoki; Kikuchi, Kenji; Tanioka, Kenkichi; Kubota, Misao; Egami, Norifumi [NHK Science and Technology Research Laboratories, 1-10-11 Kinuta Setagaya-ku, 157-8510 Tokyo (Japan); Miyakawa, Kazunori [NHK Engineering Services, Inc., 157-8540 Tokyo (Japan); Kobayashi, Akira [Hamamatsu Photonics K.K., 438-0193 Shizuoka (Japan)

    2011-09-15

    We have been developing an amorphous selenium (a-Se) avalanche multiplication photoconductive film, named HARP (high-gain avalanche rushing amorphous photoconductor), for the purpose of making a high-sensitivity video camera useful for broadcasting, x-ray medical diagnosis, etc. The HARP film used for the red channel in a colour camera is doped with tellurium (Te) to improve its red-light sensitivity. However, doping a-Se with Te generates impurity levels that trap electrons, and the built-in-field formed by these trapped electrons causes image defects. We devised a heat treatment to prevent the occurrence of these defects. We suppose that the thermal energy of the heat treatment releases the originally trapped electrons, and that the energy makes it difficult for moving electrons to be trapped during operation. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  18. Amorphous carbon nitride as an alternative electrode material in electroanalysis: simultaneous determination of dopamine and ascorbic acid.

    Science.gov (United States)

    Medeiros, Roberta A; Matos, Roberto; Benchikh, Abdelkader; Saidani, Boualem; Debiemme-Chouvy, Catherine; Deslouis, Claude; Rocha-Filho, Romeu C; Fatibello-Filho, Orlando

    2013-10-01

    Boron-doped diamond (BDD) films are excellent electrode materials, whose electrochemical activity for some analytes can be tuned by controlling their surface termination, most commonly either to predominantly hydrogen or oxygen. This tuning can be accomplished by e.g. suitable cathodic or anodic electrochemical pretreatments. Recently, it has been shown that amorphous carbon nitride (a-CNx) films may present electrochemical characteristics similar to those of BDD, including the influence of surface termination on their electrochemical activity toward some analytes. In this work, we report for the first time a complete electroanalytical method using an a-CNx electrode. Thus, an a-CNx film deposited on a stainless steel foil by DC magnetron sputtering is proposed as an alternative electrode for the simultaneous determination of dopamine (DA) and ascorbic acid (AA) in synthetic biological samples by square-wave voltammetry. The obtained results are compared with those attained using a BDD electrode. For both electrodes, a same anodic pretreatment in 0.1 mol L(-1) KOH was necessary to attain an adequate and equivalent separation of the DA and AA oxidation potential peaks of about 330 mV. The detection limits obtained for the simultaneous determination of these analytes using the a-CNx electrode were 0.0656 μmol L(-1) for DA and 1.05 μmol L(-1) for AA, whereas with the BDD electrode these values were 0.283 μmol L(-1) and 0.968 μmol L(-1), respectively. Furthermore, the results obtained in the analysis of the analytes in synthetic biological samples were satisfactory, attesting the potential application of the a-CNx electrode in electroanalysis.

  19. Effect of acetylene flow rate on morphology and structure of carbon nanotube thick films grown by thermal chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    CAO Zhangyi; SUN Zhuo; GUO Pingsheng; CHEN Yiwei

    2007-01-01

    Carbon nanotube (CNT) films were grown on nickel foil substrates by thermal chemical vapor deposition (CVD) with acetylene and hydrogen as the precursors. The morphology and structure of CNTs depending on the acetylene flow rate were characterized by a scanning electron microscope (SEM),a transmission electron microscope (TEM) and a Raman spectrometer,respectively.The effect of acetylene flow rate on the morphology and structure of CNT films was investigated.By increasing the acetylene flow rate from 10 to 90 sccm (standard cubic centimeter perminute),the yield and the diameter of CNTs increase.Also, the defects and amorphous phase in CNT films increase with increasing acetylene flow rate.

  20. Comparison of the electrical and optical properties of direct current and radio frequency sputtered amorphous indium gallium zinc oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Yao, Jianke, E-mail: yaojk@pkusz.edu.cn [School of Computer and Information Engineering, Shenzhen Graduate School of Peking University, Shenzhen 518055 (China); Gong, Li [Instrumental Analysis and Research Center, Sun Yat-Sen University, Guangzhou 10275 (China); Xie, Lei [School of Computer and Information Engineering, Shenzhen Graduate School of Peking University, Shenzhen 518055 (China); Zhang, Shengdong, E-mail: zhangsd@pku.edu.cn [School of Computer and Information Engineering, Shenzhen Graduate School of Peking University, Shenzhen 518055 (China); Institute of Microelectronics, Peking University, Beijing 100871 (China)

    2013-01-01

    The electrical and optical properties of direct current and radio frequency (RF) sputtered amorphous indium gallium zinc oxide (a-IGZO) films are compared. It is found that the RF sputtered a-IGZO films have better stoichiometry (In:Ga:Zn:O = 1:1:1:2.5–3.0), lower electrical conductivity (σ < 8 S/cm), higher refractive index (n = 1.9–2.0) and larger band gap (E{sub g} = 3.02–3.29 eV), and show less shift of Fermi level (△ E{sub F} ∼ 0.26 eV) and increased concentration of electrons (△ N{sub e} ∼ 10{sup 4}) in the conduction band with the reduction concentration of oxygen vacancy (V{sub O}). Although a-IGZO has intensively been studied for a semiconductor channel material of thin film transistors in next-generation flat panel displays, its fundamental material parameters have not been thoroughly reported. In this work, the work function (φ) of a-IGZO films is tested with the ultraviolet photoelectron spectroscopy. It is found that the φ of a-IGZO films is in the range of 4.0–5.0 eV depending on the V{sub O}. - Highlights: ► Amorphous InGaZnO{sub 4} (a-IGZO) films were prepared with different sputtering modes. ► Electrical and optical properties of the different films were compared. ► Fermi level (△E{sub F}) shift in a-IGZO films were tested by X-ray photoelectron spectroscopy. ► The relation of △E{sub F} with the properties of a-IGZO films were discussed. ► Work function was tested by ultraviolet photoelectron spectroscopy.