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Sample records for alloy-ge

  1. High thermoelectric potential of Bi2Te3 alloyed GeTe-rich phases

    Science.gov (United States)

    Madar, Naor; Givon, Tom; Mogilyansky, Dmitry; Gelbstein, Yaniv

    2016-07-01

    In an attempt to reduce our reliance on fossil fuels, associated with severe environmental effects, the current research is focused on the identification of the thermoelectric potential of p-type (GeTe)1-x(Bi2Te3)x alloys, with x values of up to 20%. Higher solubility limit of Bi2Te3 in GeTe, than previously reported, was identified around ˜9%, extending the doping potential of GeTe by the Bi2Te3 donor dopant, for an effective compensation of the high inherent hole concentration of GeTe toward thermoelectrically optimal values. Around the solubility limit of 9%, an electronic optimization resulted in an impressive maximal thermoelectric figure of merit, ZT, of ˜1.55 at ˜410 °C, which is one of the highest ever reported for any p-type GeTe-rich alloys. Beyond the solubility limit, a Fermi Level Pinning effect of stabilizing the Seebeck coefficient was observed in the x = 12%-17% range, leading to stabilization of the maximal ZTs over an extended temperature range; an effect that was associated with the potential of the governed highly symmetric Ge8Bi2Te11 and Ge4Bi2Te7 phases to create high valence band degeneracy with several bands and multiple hole pockets on the Fermi surface. At this compositional range, co-doping with additional dopants, creating shallow impurity levels (in contrast to the deep lying level created by Bi2Te3), was suggested for further electronic optimization of the thermoelectric properties.

  2. Analysis of switching conditions of chalcogenide alloys during crystallization

    Institute of Scientific and Technical Information of China (English)

    Wanhua Yu; C.D. Wright

    2006-01-01

    To understand the principle and limitation of chalcogenide alloy Ge2Sb2Te5 (GST) in solid-state memory devices during crystallization, it was necessary to develop a physically realistic model that could reflect the electrical and thermal properties of these media. A novel comprehensive numerical model has been developed for simulating these memory devices, which describes the electrical and thermal behavior using the solution of the nonlinear, time-dependent electrical and heat conduction equation. The finite-difference-time-domain technique was adopted to compute the electrical field and heat distribution in the device. Several contributing factors that affect the crystallization switching process such as the geometry of the GST layer, temperature and electric field dependency of the electrical conductivity have been discussed. The results of the simulations were then used to provide critical guidelines for fabrication and optimization of the device performance.

  3. Properties of molten Ge chalcogenides an ab initio molecular dynamics study

    CERN Document Server

    Raty, J Y; Bichara, C

    2003-01-01

    In this study, we perform first-principles molecular dynamics simulations of the eutectic alloy Ge sub 1 sub 5 Te sub 8 sub 5 at five different densities and temperatures. We obtain structures in agreement with the available diffraction data and obtain a new view of the molten Ge chalcogenides. We show that the anomalous volume contraction observed in the liquid 30 K above the eutectic temperature corresponds to a significant change of the Ge-Te partial structure factor. The detailed structural analysis shows that volume variations observed upon melting in Ge sub 1 sub 5 Te sub 8 sub 5 , as in liquid GeSe and GeTe, can be explained in terms of the competition between two types of local environment of the germanium atoms. A symmetrical coordination octahedron is entropically favoured at high temperature, while an asymmetrical octahedron resulting from the local manifestation of the Peierls distortion is electronically favoured at lower temperatures.

  4. Structure and defect processes in Si{sub 1-x-y}Ge{sub x}Sn{sub y} random alloys

    Energy Technology Data Exchange (ETDEWEB)

    Schwingenschloegl, U. [PSE Division, KAUST, Thuwal (Saudi Arabia); Chroneos, A.; Grimes, R.W. [Department of Materials, Imperial College London (United Kingdom); Jiang, C. [Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, NM (United States); Bracht, H. [Institute of Material Physics, University of Muenster (Germany)

    2010-07-01

    Binary and ternary Si{sub 1-x-y}Ge{sub x}Sn{sub y} random alloys are being considered as candidate materials to lattice match III-V or II-VI compounds with Si or Ge in optoelectronic or microelectronic devices. The simulation of the defect interactions of these alloys is hindered by their random nature. Here we use the special quasirandom approach (SQS) in conjunction with density functional theory calculations to study the structure and the defect processes. For the binary alloy Ge{sub x}Sn{sub 1-x} the SQS method correctly describes the deviation of the lattice parameters from Vegard's Law. For the ternary alloy Si{sub 0.375}Ge{sub 0.5}Sn{sub 0.125} we find an association of As atoms to lattice vacancies and the formation of As-vacancy pairs. It is predicted that the nearest-neighbour environment exerts a strong influence on the stability of these pairs.

  5. Atom probe tomography study on Ge{sub 1−x−y}Sn{sub x}C{sub y} hetero-epitaxial film on Ge substrates

    Energy Technology Data Exchange (ETDEWEB)

    Kamiyama, Eiji, E-mail: ejkamiyama@aol.com [Technology, GlobalWafers Japan Corp. Ltd., 6-861-5 Higashiko, Seiro, Niigata 957-0197 (Japan); Department of Communication Engineering, Okayama Prefectural University, 111 Kuboki, Soja-shi, Okayama-ken 719-1197 (Japan); Sueoka, Koji [Department of Communication Engineering, Okayama Prefectural University, 111 Kuboki, Soja-shi, Okayama-ken 719-1197 (Japan); Terasawa, Kengo; Yamaha, Takashi; Nakatsuka, Osamu [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Zaima, Shigeaki [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Izunome, Koji; Kashima, Kazuhiko [Technology, GlobalWafers Japan Corp. Ltd., 6-861-5 Higashiko, Seiro, Niigata 957-0197 (Japan); Uchida, Hiroshi [Physical Analysis Technology Center, Toshiba Nanoanalysis Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522 (Japan)

    2015-10-01

    We analyzed the incorporation of C atoms into a ternary alloy Ge{sub 1−x−y}Sn{sub x}C{sub y} epitaxial film on Ge substrates on a sub-nanometer scale by using atom probe tomography. Periodic atom distributions from individual (111) atomic planes were observed both in the Ge{sub 1−x−y}Sn{sub x}C{sub y} film and at the Ge substrates. Sn/C atoms had non-uniform distributions in the film. They also demonstrated a clear positive correlation in their distributions. Substitutional C atoms were only incorporated into the film when an Sn atom beam was applied onto the substrates under film growth conditions. - Highlights: • Incorporation of C atoms into epitaxial Ge{sub 1−x−y}Sn{sub x}C{sub y} film was studied. • Individual (111) atomic planes were observed by atom probe tomography. • Sn/C atoms had non-uniform distributions in the film. • Clear positive correlation in Sn/C atoms distributions was obtained.

  6. Electronic and thermal transport in GeTe: A versatile base for thermoelectric materials

    Science.gov (United States)

    Levin, E. M.; Besser, M. F.; Hanus, R.

    2013-08-01

    GeTe is a narrow-band gap semiconductor, where Ge vacancies generate free charge carriers, holes, forming a self-dopant degenerate system with p-type conductivity, and serves as a base for high-performance multicomponent thermoelectric materials. There is a significant discrepancy between the electronic and thermal transport data for GeTe-based materials reported in the literature, which obscures the baseline knowledge and prevents a clear understanding of the effect of alloying GeTe with various elements. A comprehensive study including XRD, SEM, EDS, Seebeck coefficient, electrical resistivity, thermal conductivity, and 125Te NMR of several GeTe samples was conducted. Similar Seebeck coefficient and electrical resistivity are observed for all GeTe samples used showing that the concentration of Ge vacancies generating charge carriers is constant along the ingot. Very short 125Te NMR spin-relaxation time agrees well with high carrier concentration obtained from the Hall effect measurements. Our data show that at ˜700 K, GeTe has a very large power factor, 42 μWcm-1K-2, much larger than that of any high efficiency thermoelectric telluride at these temperatures. Electronic and thermal properties of GeTe are compared to PbTe, another well-known thermoelectric material, where free charge carriers, holes or electrons, are generated by vacancies on Pb or Te sites, respectively. Discrepancy in the data for GeTe reported in literature can be attributed to the variation in the Ge:Te ratio of solidified samples as well as to different conditions of measurements.

  7. Electronic transport in amorphous phase-change materials

    Energy Technology Data Exchange (ETDEWEB)

    Luckas, Jennifer Maria

    2012-09-14

    Phase change materials combine a pronounced contrast in resistivity and reflectivity between their disordered amorphous and ordered crystalline state with very fast crystallization kinetics. Due to this exceptional combination of properties phase-change materials find broad application in non-volatile optical memories such as CD, DVD or Bluray Disc. Furthermore, this class of materials demonstrates remarkable electrical transport phenomena in their disordered state, which have shown to be crucial for their application in electronic storage devices. The threshold switching phenomenon denotes the sudden decrease in resistivity beyond a critical electrical threshold field. The threshold switching phenomenon facilitates the phase transitions at practical small voltages. Below this threshold the amorphous state resistivity is thermally activated and is observed to increase with time. This effect known as resistance drift seriously hampers the development of multi-level storage devices. Hence, understanding the physical origins of threshold switching and resistance drift phenomena is crucial to improve non-volatile phase-change memories. Even though both phenomena are often attributed to localized defect states in the band gap, the defect state density in amorphous phase-change materials has remained poorly studied. Starting from a brief introduction of the physics of phase-change materials this thesis summarizes the most important models behind electrical switching and resistance drift with the aim to discuss the role of localized defect states. The centerpiece of this thesis is the investigation of defects state densities in different amorphous phase-change materials and electrical switching chalcogenides. On the basis of Modulated Photo Current (MPC) Experiments and Photothermal Deflection Spectroscopy, a sophisticated band model for the disordered phase of the binary phase-change alloy GeTe has been developed. By this direct experimental approach the band-model for a

  8. Electronic transport in amorphous phase-change materials

    Energy Technology Data Exchange (ETDEWEB)

    Luckas, Jennifer Maria

    2012-09-14

    Phase change materials combine a pronounced contrast in resistivity and reflectivity between their disordered amorphous and ordered crystalline state with very fast crystallization kinetics. Due to this exceptional combination of properties phase-change materials find broad application in non-volatile optical memories such as CD, DVD or Bluray Disc. Furthermore, this class of materials demonstrates remarkable electrical transport phenomena in their disordered state, which have shown to be crucial for their application in electronic storage devices. The threshold switching phenomenon denotes the sudden decrease in resistivity beyond a critical electrical threshold field. The threshold switching phenomenon facilitates the phase transitions at practical small voltages. Below this threshold the amorphous state resistivity is thermally activated and is observed to increase with time. This effect known as resistance drift seriously hampers the development of multi-level storage devices. Hence, understanding the physical origins of threshold switching and resistance drift phenomena is crucial to improve non-volatile phase-change memories. Even though both phenomena are often attributed to localized defect states in the band gap, the defect state density in amorphous phase-change materials has remained poorly studied. Starting from a brief introduction of the physics of phase-change materials this thesis summarizes the most important models behind electrical switching and resistance drift with the aim to discuss the role of localized defect states. The centerpiece of this thesis is the investigation of defects state densities in different amorphous phase-change materials and electrical switching chalcogenides. On the basis of Modulated Photo Current (MPC) Experiments and Photothermal Deflection Spectroscopy, a sophisticated band model for the disordered phase of the binary phase-change alloy GeTe has been developed. By this direct experimental approach the band-model for a