WorldWideScience

Sample records for affects comodulation masking

  1. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin D.; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    It has been suggested that the level dependence of the upper masking slopebe utilised in perceptual models in bit-rate reduction systems. However,comodulation masking release (CMR) phenomena lead to a reduction of themasking effect when a masker and a probe signal are amplitude modulated withthe ...

  2. Modeling comodulation masking release using an equalization cancellation mechanism

    DEFF Research Database (Denmark)

    Piechowiak, Tobias; Ewert, Stephan; Dau, Torsten

    facilitation of detecting a signal in noise is comodulation masking release (CMR). It has been suggested that in (monaural) across-channel processing, like in (binaural) across-ear processing, an equalization-cancellation (EC) based circuit might be an effective strategy of noise reduction. The first part of...... the study investigates the relation between CMR and envelope-based binaural masking level differences (BMLD), using narrowband noise maskers and classical across-channel configurations (like N0Spi, N0Sm). In the second part, a model is presented that explicitly simulates CMR whereby the EC mechanism......Across-filter comparisons of temporal envelopes are a general feature of auditory pattern analysis which plays an important role in extracting signals from noise backgrounds. One example where a comparison of the temporal envelope in different frequency regions can lead to a substantial...

  3. Modeling within- and across-channel processes in comodulation masking release

    DEFF Research Database (Denmark)

    Dau, Torsten; Piechowiak, Tobias; Ewert, Stephan D

    2013-01-01

    The relative contributions of within-channel and across-channel processes to perceptual comodulation masking release (CMR) were investigated in the framework of an auditory processing model. A generalized version of the computational auditory signal processing and perception model [CASP; Jepsen et...... al., J. Acoust. Soc. Am. 124, 422-438 (2008)] was used and extended by an across-channel modulation processing stage according to Piechowiak et al. [J. Acoust. Soc. Am. 121, 2111-2126 (2007)]. Five experimental paradigms were considered: CMR with a broadband noise masker as a function of the masker...... different mechanisms contribute to overall CMR in the considered conditions: (1) a within-channel process based on changes in the envelope characteristic due to the addition of the signal to the masker; (2) a within-channel process based on nonlinear peripheral processing of the OFB's envelope caused...

  4. Can comodulation masking release occur when frequency changes could promote perceptual segregation of the on-frequency and flanking bands?

    DEFF Research Database (Denmark)

    Verhey, Jesko L; Epp, Bastian; Stasiak, Arkadiusz;

    2013-01-01

    A common characteristic of natural sounds is that the level fluctuations in different frequency regions are coherent. The ability of the auditory system to use this comodulation is shown when a sinusoidal signal is masked by a masker centred at the signal frequency (on-frequency masker, OFM...... and comodulation could serve as cues to indicate which of the stimulus components originate from one source. If the common fate of frequency components is the stronger binding cue, the sweeping FBs and the OFM with a fixed centre frequency should no longer form one auditory object and the CMR should be abolished...... bands relative to the inhibitory areas (as seen in physiological recordings using stationary flanking bands). Preliminary physiological results in the cochlear nucleus of the Guinea pig show that a correlate of CMR can also be found at this level of the auditory pathway with sweeping flanking bands....

  5. Comparison of intensity discrimination, increment detection, and comodulation masking release in the envelope and audio-frequency domains

    DEFF Research Database (Denmark)

    Nelson, Paul C.; Ewert, Stephan; Carney, Laurel H.;

    on the masking waveform in both domains. A significant release from masking of a 32-Hz signal in the modulation frequency domain was obtained only when the venelope fluctuations were slower than 1–2 Hz. Both experiments suggest a relatively weak contribution of venelope cues in the AM domain when compared......In the audio-frequency domain, the envelope apparently plays an important role in detection of intensity increments and in comodulation masking release (CMR). The current study addressed the question whether the second-order envelope ("venelope") contributes similarly for comparable experiments...... in the envelope-frequency domain. One set of experiments examined the relationship between gated intensity discrimination and continuous-carrier increment detection. In contrast to the asymmetry observed in the audio-frequency domain (listeners are more sensitive to increments), AM-depth discrimination thresholds...

  6. Hearing Mechanisms and Noise Metrics Related to Auditory Masking in Bottlenose Dolphins (Tursiops truncatus).

    Science.gov (United States)

    Branstetter, Brian K; Bakhtiari, Kimberly L; Trickey, Jennifer S; Finneran, James J

    2016-01-01

    Odontocete cetaceans are acoustic specialists that depend on sound to hunt, forage, navigate, detect predators, and communicate. Auditory masking from natural and anthropogenic sound sources may adversely affect these fitness-related capabilities. The ability to detect a tone in a broad range of natural, anthropogenic, and synthesized noise was tested with bottlenose dolphins using a psychophysical, band-widening procedure. Diverging masking patterns were found for noise bandwidths greater than the width of an auditory filter. Despite different noise types having equal-pressure spectral-density levels (95 dB re 1 μPa(2)/Hz), masked detection threshold differences were as large as 22 dB. Consecutive experiments indicated that noise types with increased levels of amplitude modulation resulted in comodulation masking release due to within-channel and across-channel auditory mechanisms. The degree to which noise types were comodulated (comodulation index) was assessed by calculating the magnitude-squared coherence between the temporal envelope from an auditory filter centered on the signal and temporal envelopes from flanking filters. Statistical models indicate that masked thresholds in a variety of noise types, at a variety of levels, can be explained with metrics related to the comodulation index in addition to the pressure spectral-density level of noise. This study suggests that predicting auditory masking from ocean noise sources depends on both spectral and temporal properties of the noise. PMID:26610950

  7. *-Modules, co-*-modules and cotilting modules over Noetherian rings

    Institute of Scientific and Technical Information of China (English)

    汪明义; 许永华

    1996-01-01

    Let R be a Noetherian ring. The projectivity and injectivity of modules over R are discussed. The concept of modules is introduced and the descriptions for co-*-modules over R are given. At last, cotilting modules over R are characterized by means of co-*-modules.

  8. Separation of musical instruments based on amplitude and frequency comodulation

    Science.gov (United States)

    Jacobson, Barry D.; Cauwenberghs, Gert; Quatieri, Thomas F.

    2002-05-01

    In previous work, amplitude comodulation was investigated as a basis for monaural source separation. Amplitude comodulation refers to similarities in amplitude envelopes of individual spectral components emitted by particular types of sources. In many types of musical instruments, amplitudes of all resonant modes rise/fall, and start/stop together during the course of normal playing. We found that under certain well-defined conditions, a mixture of constant frequency, amplitude comodulated sources can unambiguously be decomposed into its constituents on the basis of these similarities. In this work, system performance was improved by relaxing the constant frequency requirement. String instruments, for example, which are normally played with vibrato, are both amplitude and frequency comodulated sources, and could not be properly tracked under the constant frequency assumption upon which our original algorithm was based. Frequency comodulation refers to similarities in frequency variations of individual harmonics emitted by these types of sources. The analytical difficulty is in defining a representation of the source which properly tracks frequency varying components. A simple, fixed filter bank can only track an individual spectral component for the duration in which it is within the passband of one of the filters. Alternatives are therefore explored which are amenable to real-time implementation.

  9. Word Meaning Frequencies Affect Negative Compatibility Effects In Masked Priming.

    Science.gov (United States)

    Brocher, Andreas; Koenig, Jean-Pierre

    2016-01-01

    Negative compatibility effects (NCEs)-that is, slower responses to targets in related than unrelated prime-target pairs, have been observed in studies using stimulus-response (S-R) priming with stimuli like arrows and plus signs. Although there is no consensus on the underlying mechanism, explanations tend to locate NCEs within the motor-response system. A characteristic property of perceptuo-motor NCEs is a biphasic pattern of activation: A brief period in which very briefly presented (typically) masked primes facilitate processing of related targets is followed by a phase of target processing impairment. In this paper, we present data that suggest that NCEs are not restricted to S-R priming with low-level visual stimuli: The brief (50 ms), backward masked (250 ms) presentation of ambiguous words (bank) leads to slower responses than baseline to words related to the more frequent (rob) but not less frequent meaning (swim). Importantly, we found that slowed responses are preceded by a short phase of response facilitation, replicating the biphasic pattern reported for arrows and plus signs. The biphasic pattern of priming and the fact that the NCEs were found only for target words that are related to their prime word's more frequent meaning has strong implications for any theory of NCEs that locate these effects exclusively within the motor-response system. PMID:27152129

  10. Communication masking in marine mammals: A review and research strategy.

    Science.gov (United States)

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals. PMID:26707982

  11. Communication masking in marine mammals: A review and research strategy.

    Science.gov (United States)

    Erbe, Christine; Reichmuth, Colleen; Cunningham, Kane; Lucke, Klaus; Dooling, Robert

    2016-02-15

    Underwater noise, whether of natural or anthropogenic origin, has the ability to interfere with the way in which marine mammals receive acoustic signals (i.e., for communication, social interaction, foraging, navigation, etc.). This phenomenon, termed auditory masking, has been well studied in humans and terrestrial vertebrates (in particular birds), but less so in marine mammals. Anthropogenic underwater noise seems to be increasing in parts of the world's oceans and concerns about associated bioacoustic effects, including masking, are growing. In this article, we review our understanding of masking in marine mammals, summarise data on marine mammal hearing as they relate to masking (including audiograms, critical ratios, critical bandwidths, and auditory integration times), discuss masking release processes of receivers (including comodulation masking release and spatial release from masking) and anti-masking strategies of signalers (e.g. Lombard effect), and set a research framework for improved assessment of potential masking in marine mammals.

  12. π-H-comodule algebra and π-H-comodule subalgebra%π-H-余模代数与π-H-余模子代数

    Institute of Scientific and Technical Information of China (English)

    赵士银; 周坚

    2014-01-01

    研究了π-H-余模子代数的相关性质。借助对偶原理证明了M 是π-H-余模代数A的π-H-余模子代数当且仅当M⊥是π-H-模余代数A的π-H-模余理想。%Some properties of π-H-comodule subalgebra are studied. With the help of the dual principle, we prove that M is aπ-H-comodule subalgebra of A if and only if M⊥ is aπ-H-module coideal of A.

  13. Mechanisms of within- and across- channel processing in comodulation masking release

    DEFF Research Database (Denmark)

    Piechowiak, Tobias

    2007-01-01

    patterns of amplitude modulation. Most ecologically relevant sounds, such as speech and animal vocalizations, have coherent amplitude modulation patterns across different frequency regions, suggesting that the detection and recognition advantages conveyed by such coherent modulations may play a fundamental...

  14. A study on the factors that affect the advanced mask defect verification

    Science.gov (United States)

    Woo, Sungha; Jang, Heeyeon; Lee, Youngmo; Kim, Sangpyo; Yim, Donggyu

    2015-10-01

    Defect verification has become significantly difficult to higher technology nodes over the years. Traditional primary method of defect (include repair point) control consists of inspection, AIMS and repair steps. Among them, AIMS process needs various wafer lithography conditions, such as NA, inner/outer sigma, illumination shape and etc. It has a limit to analyze for every layer accurately because AIMS tool uses the physical aperture system. And it requires meticulous management of exposure condition and CD target value which change frequently in advanced mask. We report on the influence of several AIMS parameters on the defect analysis including repair point. Under various illumination conditions with different patterns, it showed the significant correlation in defect analysis results. It is able to analyze defect under certain error budget based on the management specification required for each layer. In addition, it provided us with one of the clues in the analysis of wafer repeating defect. Finally we will present 'optimal specification' for defect management with common AIMS recipe and suggest advanced mask process flow.

  15. The Attentional Blink Is Not Affected by Backward Masking of T2, T2-Mask SOA, or Level of T2 Impoverishment

    Science.gov (United States)

    Jannati, Ali; Spalek, Thomas M.; Lagroix, Hayley E. P.; Di Lollo, Vincent

    2012-01-01

    Identification of the second of two targets (T2) is impaired when presented shortly after the first (T1). This "attentional blink" (AB) is thought to arise from a delay in T2 processing during which T2 is vulnerable to masking. Conventional studies have measured T2 accuracy which is constrained by the 100% ceiling. We avoided this problem by using…

  16. Ophthalmological affectation: A way to mask Miastenia Gravis. A case purpose.

    Directory of Open Access Journals (Sweden)

    Néstor R. Sánchez Dacal

    2012-06-01

    Full Text Available Myasthenia Gravis MG is an autoimmune and chronic neuromuscular disease characterized by variable of weakness in the skeletal muscles that control the eye movements and it is confused with an ophthalmological disorder. With this presentation we pretend to systematize the Theoretical references about MG which allow making a correct diagnosis of the disease from the experience of a clinical case. The theory about MG regarding the presentation of the disease is discussed, emphasising on the significance of its differential diagnosis with an ophthalmopathy, which will contribute to apply a proper treatment and a satisfactory evolution of the patient, arriving to the conclusion that affectation of the III cranial pair is a way of frequent presentation of MG, being valuable the differential diagnosis of the ophthalmopaties in these entities.

  17. The relative Picard group of a comodule algebra and Harrison cohomology

    OpenAIRE

    Caenepeel, S.; Guedenon, T.

    2004-01-01

    Let $A$ be a commutative comodule algebra over a commutative bialgebra $H$. The group of invertible relative Hopf modules maps to the Picard group of $A$, and the kernel is described as a quotient group of the group of invertible grouplike elements of the coring $A\\ot H$, or as a Harrison cohomology group. Our methods are based on elementary $K$-theory. The Hilbert 90 Theorem follows as a corollary. The part of the Picard group of the coinvariants that becomes trivial after base extension emb...

  18. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  19. Setting thresholds to varying blood pressure monitoring intervals differentially affects risk estimates associated with white-coat and masked hypertension in the population

    DEFF Research Database (Denmark)

    Asayama, Kei; Thijs, Lutgarde; Li, Yan;

    2014-01-01

    Outcome-driven recommendations about time intervals during which ambulatory blood pressure should be measured to diagnose white-coat or masked hypertension are lacking. We cross-classified 8237 untreated participants (mean age, 50.7 years; 48.4% women) enrolled in 12 population studies, using ≥140....../≥90, ≥130/≥80, ≥135/≥85, and ≥120/≥70 mm Hg as hypertension thresholds for conventional, 24-hour, daytime, and nighttime blood pressure. White-coat hypertension was hypertension on conventional measurement with ambulatory normotension, the opposite condition being masked hypertension. Intervals used...... 1.76 to 2.03. In conclusion, identification of truly low-risk white-coat hypertension requires setting thresholds simultaneously to 24 hours, daytime, and nighttime blood pressure. Although any time interval suffices to diagnose masked hypertension, as proposed in current guidelines, full 24-hour...

  20. Setting thresholds to varying blood pressure monitoring intervals differentially affects risk estimates associated with white-coat and masked hypertension in the population.

    Science.gov (United States)

    Asayama, Kei; Thijs, Lutgarde; Li, Yan; Gu, Yu-Mei; Hara, Azusa; Liu, Yan-Ping; Zhang, Zhenyu; Wei, Fang-Fei; Lujambio, Inés; Mena, Luis J; Boggia, José; Hansen, Tine W; Björklund-Bodegård, Kristina; Nomura, Kyoko; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Stolarz-Skrzypek, Katarzyna; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Luzardo, Leonella; Kawecka-Jaszcz, Kalina; Sandoya, Edgardo; Filipovský, Jan; Maestre, Gladys E; Wang, Jiguang; Imai, Yutaka; Franklin, Stanley S; O'Brien, Eoin; Staessen, Jan A

    2014-11-01

    Outcome-driven recommendations about time intervals during which ambulatory blood pressure should be measured to diagnose white-coat or masked hypertension are lacking. We cross-classified 8237 untreated participants (mean age, 50.7 years; 48.4% women) enrolled in 12 population studies, using ≥140/≥90, ≥130/≥80, ≥135/≥85, and ≥120/≥70 mm Hg as hypertension thresholds for conventional, 24-hour, daytime, and nighttime blood pressure. White-coat hypertension was hypertension on conventional measurement with ambulatory normotension, the opposite condition being masked hypertension. Intervals used for classification of participants were daytime, nighttime, and 24 hours, first considered separately, and next combined as 24 hours plus daytime or plus nighttime, or plus both. Depending on time intervals chosen, white-coat and masked hypertension frequencies ranged from 6.3% to 12.5% and from 9.7% to 19.6%, respectively. During 91 046 person-years, 729 participants experienced a cardiovascular event. In multivariable analyses with normotension during all intervals of the day as reference, hazard ratios associated with white-coat hypertension progressively weakened considering daytime only (1.38; P=0.033), nighttime only (1.43; P=0.0074), 24 hours only (1.21; P=0.20), 24 hours plus daytime (1.24; P=0.18), 24 hours plus nighttime (1.15; P=0.39), and 24 hours plus daytime and nighttime (1.16; P=0.41). The hazard ratios comparing masked hypertension with normotension were all significant (Phypertension requires setting thresholds simultaneously to 24 hours, daytime, and nighttime blood pressure. Although any time interval suffices to diagnose masked hypertension, as proposed in current guidelines, full 24-hour recordings remain standard in clinical practice.

  1. The mask of psychotic diagnoses.

    Science.gov (United States)

    Garfield, David

    2003-01-01

    Chronic mental illness results in the patient becoming adhered to a DSM-IV diagnostic label. Over time, this diagnosis can expand and become a "mask" that invisibly covers over the true person of the patient. Most commonly, two things then occur. First, the outside world forgets that the patient is a person and family, friends, staff, and doctors begin to treat the patient according to the superficial aspects of what the mask of the diagnosis connotes, rather than connecting with the person struggling with the illness. Second and, perhaps, more insidious, is that the patient, who has been vulnerable and shattered by his or her experience and battle with the illness, adopts the mask as a kind of invisible protective shield. The task of making contact with the patient behind the mask of the diagnosis is therefore a formidable one for psychoanalysts and therapists and staff who work with seriously ill patients. Treatment must focus on the dual process of interfering with the patient's use of the diagnostic mask while, at the same time, making safe contact with the person of the patient behind the mask. A focus on affect can help achieve these dual goals. By utilizing Semrad's (Semrad and van Buskirk, 1969) method of noticing and asking about "feelings" as conveyed by hallucinations, delusions, or bodily sensations, a reliable relationship can evolve and the clinician can come to have an important "selfobject" (Kohut, 1971) meaning for the patient. By attuning to the patient's "vitality" affects (Stern, 1985), great stability and a new sense of "aliveness" is made possible to help the patient emerge from the deadening effects of the illness and the mask of the diagnosis. PMID:12722887

  2. Electrostatic mask protection for extreme ultraviolet lithography

    NARCIS (Netherlands)

    Moors, R.; Heerens, G.J.

    2002-01-01

    Electrostatic protection of mask for extreme ultraviolet lithography (EUVL) was discussed. Both charged and neutral particles could be prevented from moving towards the mask by choosing a nonuniform electrical field. Benefits of electrostatic protection are that it does not affect the EUV beam and w

  3. Keeping African Masks Real

    Science.gov (United States)

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  4. Mask degradation monitoring with aerial mask inspector

    Science.gov (United States)

    Tseng, Wen-Jui; Fu, Yung-Ying; Lu, Shih-Ping; Jiang, Ming-Sian; Lin, Jeffrey; Wu, Clare; Lifschitz, Sivan; Tam, Aviram

    2013-06-01

    As design rule continues to shrink, microlithography is becoming more challenging and the photomasks need to comply with high scanner laser energy, low CDU, and ever more aggressive RETs. This give rise to numerous challenges in the semiconductor wafer fabrication plants. Some of these challenges being contamination (mainly haze and particles), mask pattern degradation (MoSi oxidation, chrome migration, etc.) and pellicle degradation. Fabs are constantly working to establish an efficient methodology to manage these challenges mainly using mask inspection, wafer inspection, SEM review and CD SEMs. Aerial technology offers a unique opportunity to address the above mask related challenges using one tool. The Applied Materials Aera3TM system has the inherent ability to inspect for defects (haze, particles, etc.), and track mask degradation (e.g. CDU). This paper focuses on haze monitoring, which is still a significant challenge in semiconductor manufacturing, and mask degradation effects that are starting to emerge as the next challenge for high volume semiconductor manufacturers. The paper describes Aerial inspector (Aera3) early haze methodology and mask degradation tracking related to high volume manufacturing. These will be demonstrated on memory products. At the end of the paper we take a brief look on subsequent work currently conducted on the more general issue of photo mask degradation monitoring by means of an Aerial inspector.

  5. 2013 mask industry survey

    Science.gov (United States)

    Malloy, Matt

    2013-09-01

    A comprehensive survey was sent to merchant and captive mask shops to gather information about the mask industry as an objective assessment of its overall condition. 2013 marks the 12th consecutive year for this process. Historical topics including general mask profile, mask processing, data and write time, yield and yield loss, delivery times, maintenance, and returns were included and new topics were added. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. While each year's survey includes minor updates based on feedback from past years and the need to collect additional data on key topics, the bulk of the survey and reporting structure have remained relatively constant. A series of improvements is being phased in beginning in 2013 to add value to a wider audience, while at the same time retaining the historical content required for trend analyses of the traditional metrics. Additions in 2013 include topics such as top challenges, future concerns, and additional details in key aspects of mask masking, such as the number of masks per mask set per ground rule, minimum mask resolution shipped, and yield by ground rule. These expansions beyond the historical topics are aimed at identifying common issues, gaps, and needs. They will also provide a better understanding of real-life mask requirements and capabilities for comparison to the International Technology Roadmap for Semiconductors (ITRS).

  6. Primary sensory and motor cortex excitability are co-modulated in response to peripheral electrical nerve stimulation.

    Directory of Open Access Journals (Sweden)

    Siobhan M Schabrun

    Full Text Available Peripheral electrical stimulation (PES is a common clinical technique known to induce changes in corticomotor excitability; PES applied to induce a tetanic motor contraction increases, and PES at sub-motor threshold (sensory intensities decreases, corticomotor excitability. Understanding of the mechanisms underlying these opposite changes in corticomotor excitability remains elusive. Modulation of primary sensory cortex (S1 excitability could underlie altered corticomotor excitability with PES. Here we examined whether changes in primary sensory (S1 and motor (M1 cortex excitability follow the same time-course when PES is applied using identical stimulus parameters. Corticomotor excitability was measured using transcranial magnetic stimulation (TMS and sensory cortex excitability using somatosensory evoked potentials (SEPs before and after 30 min of PES to right abductor pollicis brevis (APB. Two PES paradigms were tested in separate sessions; PES sufficient to induce a tetanic motor contraction (30-50 Hz; strong motor intensity and PES at sub motor-threshold intensity (100 Hz. PES applied to induce strong activation of APB increased the size of the N(20-P(25 component, thought to reflect sensory processing at cortical level, and increased corticomotor excitability. PES at sensory intensity decreased the size of the P25-N33 component and reduced corticomotor excitability. A positive correlation was observed between the changes in amplitude of the cortical SEP components and corticomotor excitability following sensory and motor PES. Sensory PES also increased the sub-cortical P(14-N(20 SEP component. These findings provide evidence that PES results in co-modulation of S1 and M1 excitability, possibly due to cortico-cortical projections between S1 and M1. This mechanism may underpin changes in corticomotor excitability in response to afferent input generated by PES.

  7. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  8. Binary mask programmable hologram.

    Science.gov (United States)

    Tsang, P W M; Poon, T-C; Zhou, Changhe; Cheung, K W K

    2012-11-19

    We report, for the first time, the concept and generation of a novel Fresnel hologram called the digital binary mask programmable hologram (BMPH). A BMPH is comprised of a static, high resolution binary grating that is overlaid with a lower resolution binary mask. The reconstructed image of the BMPH can be programmed to approximate a target image (including both intensity and depth information) by configuring the pattern of the binary mask with a simple genetic algorithm (SGA). As the low resolution binary mask can be realized with less stringent display technology, our method enables the development of simple and economical holographic video display.

  9. Traditional Chinese Masks Reveal Customs

    Institute of Scientific and Technical Information of China (English)

    1996-01-01

    CHINESE masks are undoubtedly an important component in the worldwide mask culture. Minority nationality masks are a major component of China’s mask culture. Traditional Chinese masks, or nuo, represent a cultural component which originated from religious rites in prehistoric times. Various types of nuo are highly valuable for studies of Chinese customs.

  10. Effect of Dietary Supplements in Reducing Probability of Death for Uremic Crises in Dogs Affected by Chronic Kidney Disease (Masked RCCT

    Directory of Open Access Journals (Sweden)

    Andrea Zatelli

    2012-01-01

    Full Text Available Chitosan and alkalinizing agents can decrease morbidity and mortality in humans with chronic kidney disease (CKD. Whether this holds true in dog is not known. Objective of the study was to determine whether a commercial dietary supplement containing chitosan, phosphate binders, and alkalinizing agents (Renal, compared to placebo, reduces mortality rate due to uremic crises in dogs with spontaneous CKD, fed a renal diet (RD. A masked RCCT was performed including 31 azotemic dogs with spontaneous CKD. Dogs enrolled in the study were randomly allocated to receive RD plus placebo (group A; 15 dogs or RD plus Renal (group B; 16 dogs. During a first 4-week period, all dogs were fed an RD and then randomized and clinically evaluated up to 44 weeks. The effects of dietary supplements on mortality rate due to uremic crises were assessed. At 44 weeks, compared to group A, dogs in group B had approximately 50% lower mortality rate due to uremic crises (P=0.015. Dietary supplementation with chitosan, phosphate binders, and alkalinizing agents, along with an RD, is beneficial in reducing mortality rate in dogs with spontaneous CKD.

  11. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  12. Mask Phenomenon in Communication

    Institute of Scientific and Technical Information of China (English)

    郎丽璇

    2013-01-01

    People sometimes wear masks. Abusive expression may be used to convey love while polite words can be exchanged among enemies. This essay describes and discusses this special phenomenon in communication and analyzes the elements that con-tribute to the success of a mask communication.

  13. Intact crowding and temporal masking in dyslexia.

    Science.gov (United States)

    Doron, Adi; Manassi, Mauro; Herzog, Michael H; Ahissar, Merav

    2015-01-01

    Phonological deficits in dyslexia are well documented. However, there is an ongoing discussion about whether visual deficits limit the reading skills of people with dyslexia. Here, we investigated visual crowding and backward masking. We presented a Vernier (i.e., two vertical bars slightly offset to the left or right) and asked observers to indicate the offset direction. Vernier stimuli are visually similar to letters and are strongly affected by crowding, even in the fovea. To increase task difficulty, Verniers are often followed by a mask (i.e., backward masking). We measured Vernier offset discrimination thresholds for the basic Vernier task, under crowding, and under backward masking, in students with dyslexia (n = 19) and age and intelligence matched students (n = 27). We found no group differences in any of these conditions. Controls with fast visual processing (good backward masking performance), were faster readers. By contrast, no such correlation was found among the students with dyslexia, suggesting that backward masking does not limit their reading efficiency. These findings indicate that neither elevated crowding nor elevated backward masking pose a bottleneck to reading skills of people with dyslexia.

  14. Reflective masks for extreme ultraviolet lithography

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Khanh Bao

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 {mu}m wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  15. Interaural level differences do not suffice for restoring spatial release from masking in simulated cochlear implant listening.

    Directory of Open Access Journals (Sweden)

    Antje Ihlefeld

    Full Text Available Spatial release from masking refers to a benefit for speech understanding. It occurs when a target talker and a masker talker are spatially separated. In those cases, speech intelligibility for target speech is typically higher than when both talkers are at the same location. In cochlear implant listeners, spatial release from masking is much reduced or absent compared with normal hearing listeners. Perhaps this reduced spatial release occurs because cochlear implant listeners cannot effectively attend to spatial cues. Three experiments examined factors that may interfere with deploying spatial attention to a target talker masked by another talker. To simulate cochlear implant listening, stimuli were vocoded with two unique features. First, we used 50-Hz low-pass filtered speech envelopes and noise carriers, strongly reducing the possibility of temporal pitch cues; second, co-modulation was imposed on target and masker utterances to enhance perceptual fusion between the two sources. Stimuli were presented over headphones. Experiments 1 and 2 presented high-fidelity spatial cues with unprocessed and vocoded speech. Experiment 3 maintained faithful long-term average interaural level differences but presented scrambled interaural time differences with vocoded speech. Results show a robust spatial release from masking in Experiments 1 and 2, and a greatly reduced spatial release in Experiment 3. Faithful long-term average interaural level differences were insufficient for producing spatial release from masking. This suggests that appropriate interaural time differences are necessary for restoring spatial release from masking, at least for a situation where there are few viable alternative segregation cues.

  16. The Moody Mask Model

    DEFF Research Database (Denmark)

    Larsen, Bjarke Alexander; Andkjær, Kasper Ingdahl; Schoenau-Fog, Henrik

    2015-01-01

    This paper proposes a new relation model, called "The Moody Mask model", for Interactive Digital Storytelling (IDS), based on Franceso Osborne's "Mask Model" from 2011. This, mixed with some elements from Chris Crawford's Personality Models, is a system designed for dynamic interaction between...... that the Moody Mask model was not signicantly improved by adding interactivity, except in a few logical areas. It also performed worse than other IDS applications in all areas. The participants reported issues with the lack of feedback from direct actions, repetitive actions, and problems with the story scenario...... and UI. With these issues solved, though, there are indications that this model might have potential....

  17. BIRD FLU MASKS

    OpenAIRE

    YASAR KESKIN; OÐUZ OZYARAL

    2006-01-01

    Avian influenza (bird flu) is a disease of birds caused by influenza viruses closely related to human influenza viruses. The potential for transformation of avian influenza into a form that both causes severe disease in humans and spreads easily from person to person is a great concern for world health. The main purpose of a mask is to help prevent particles (droplets) being expelled into the environment by the wearer. Masks are also resistant to fluids, and help protect the wearer from splas...

  18. New mask technology challenges

    Science.gov (United States)

    Kimmel, Kurt R.

    2001-09-01

    Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

  19. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experime...... mask using a directional system and a method for correcting errors in the target binary mask. The last part of the thesis, proposes a new method for objective evaluation of speech intelligibility.......The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either...... experiments under ideal conditions or as experiments under more realistic conditions useful for real-life applications such as hearing aids. In the experiments under ideal conditions, the previously defined ideal binary mask is evaluated using hearing impaired listeners, and a novel binary mask -- the target...

  20. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  1. Who's behind that mask and cape? The Asian leopard cat's Agouti (ASIP) allele likely affects coat colour phenotype in the Bengal cat breed.

    Science.gov (United States)

    Gershony, L C; Penedo, M C T; Davis, B W; Murphy, W J; Helps, C R; Lyons, L A

    2014-12-01

    Coat colours and patterns are highly variable in cats and are determined mainly by several genes with Mendelian inheritance. A 2-bp deletion in agouti signalling protein (ASIP) is associated with melanism in domestic cats. Bengal cats are hybrids between domestic cats and Asian leopard cats (Prionailurus bengalensis), and the charcoal coat colouration/pattern in Bengals presents as a possible incomplete melanism. The complete coding region of ASIP was directly sequenced in Asian leopard, domestic and Bengal cats. Twenty-seven variants were identified between domestic and leopard cats and were investigated in Bengals and Savannahs, a hybrid with servals (Leptailurus serval). The leopard cat ASIP haplotype was distinguished from domestic cat by four synonymous and four non-synonymous exonic SNPs, as well as 19 intronic variants, including a 42-bp deletion in intron 4. Fifty-six of 64 reported charcoal cats were compound heterozygotes at ASIP, with leopard cat agouti (A(P) (be) ) and domestic cat non-agouti (a) haplotypes. Twenty-four Bengals had an additional unique haplotype (A2) for exon 2 that was not identified in leopard cats, servals or jungle cats (Felis chaus). The compound heterozygote state suggests the leopard cat allele, in combination with the recessive non-agouti allele, influences Bengal markings, producing a darker, yet not completely melanistic coat. This is the first validation of a leopard cat allele segregating in the Bengal breed and likely affecting their overall pelage phenotype. Genetic testing services need to be aware of the possible segregation of wild felid alleles in all assays performed on hybrid cats. PMID:25143047

  2. Who's behind that mask and cape? The Asian leopard cat's Agouti (ASIP) allele likely affects coat colour phenotype in the Bengal cat breed.

    Science.gov (United States)

    Gershony, L C; Penedo, M C T; Davis, B W; Murphy, W J; Helps, C R; Lyons, L A

    2014-12-01

    Coat colours and patterns are highly variable in cats and are determined mainly by several genes with Mendelian inheritance. A 2-bp deletion in agouti signalling protein (ASIP) is associated with melanism in domestic cats. Bengal cats are hybrids between domestic cats and Asian leopard cats (Prionailurus bengalensis), and the charcoal coat colouration/pattern in Bengals presents as a possible incomplete melanism. The complete coding region of ASIP was directly sequenced in Asian leopard, domestic and Bengal cats. Twenty-seven variants were identified between domestic and leopard cats and were investigated in Bengals and Savannahs, a hybrid with servals (Leptailurus serval). The leopard cat ASIP haplotype was distinguished from domestic cat by four synonymous and four non-synonymous exonic SNPs, as well as 19 intronic variants, including a 42-bp deletion in intron 4. Fifty-six of 64 reported charcoal cats were compound heterozygotes at ASIP, with leopard cat agouti (A(P) (be) ) and domestic cat non-agouti (a) haplotypes. Twenty-four Bengals had an additional unique haplotype (A2) for exon 2 that was not identified in leopard cats, servals or jungle cats (Felis chaus). The compound heterozygote state suggests the leopard cat allele, in combination with the recessive non-agouti allele, influences Bengal markings, producing a darker, yet not completely melanistic coat. This is the first validation of a leopard cat allele segregating in the Bengal breed and likely affecting their overall pelage phenotype. Genetic testing services need to be aware of the possible segregation of wild felid alleles in all assays performed on hybrid cats.

  3. Masked mycotoxins: a review.

    Science.gov (United States)

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders.

  4. CADAT integrated circuit mask analysis

    Science.gov (United States)

    1981-01-01

    CADAT System Mask Analysis Program (MAPS2) is automated software tool for analyzing integrated-circuit mask design. Included in MAPS2 functions are artwork verification, device identification, nodal analysis, capacitance calculation, and logic equation generation.

  5. Affectivity

    OpenAIRE

    Stenner, Paul; Greco, Monica

    2013-01-01

    The concept of affectivity has assumed central importance in much recent scholarship, and many in the social sciences and humanities now talk of an ‘affective turn’. The concept of affectivity at play in this ‘turn’ remains, however, somewhat vague and slippery. Starting with Silvan Tomkins’ influential theory of affect, this paper will explore the relevance of the general assumptions (or ‘utmost abstractions’) that inform thinking about affectivity. The technological and instrumentalist char...

  6. Mask Blank Defect Detection

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, M A; Sommargren, G E

    2000-02-04

    Mask blanks are the substrates that hold the master patterns for integrated circuits. Integrated circuits are semiconductor devices, such as microprocessors (mPs), dynamic random access memory (DRAMs), and application specific integrated circuits (ASICs) that are central to the computer, communication, and electronics industries. These devices are fabricated using a set of master patterns that are sequentially imaged onto light-sensitive coated silicon wafers and processed to form thin layers of insulating and conductive materials on top of the wafer. These materials form electrical paths and transistors that control the flow of electricity through the device. For the past forty years the semiconductor industry has made phenomenal improvements in device functionality, compactness, speed, power, and cost. This progress is principally due to the exponential decrease in the minimum feature size of integrated circuits, which has been reduced by a factor of {radical}2 every three years. Since 1992 the Semiconductor Industry Association (SIA) has coordinated the efforts of producing a technology roadmap for semiconductors. In the latest document, ''The International Technology Roadmap for Semiconductors: 1999'', future technology nodes (minimum feature sizes) and targeted dates were specified and are summarized in Table 1. Lithography is the imaging technology for producing a de-magnified image of the mask on the wafer. A typical de-magnification factor is 4. Mask blank defects as small as one-eighth the equivalent minimum feature size are printable and may cause device failure. Defects might be the result of the surface preparation, such as polishing, or contamination due to handling or the environment. Table 2 shows the maximum tolerable defect sizes on the mask blank for each technology node. This downward trend puts a tremendous burden on mask fabrication, particularly in the area of defect detection and reduction. A new infrastructure for mask

  7. Masked mycotoxins: a review

    OpenAIRE

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; De Saeger, Sarah; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed re...

  8. Masked mycotoxins: A review

    OpenAIRE

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; De Saeger, Sarah; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2012-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed re...

  9. Mask strategy at International SEMATECH

    Science.gov (United States)

    Kimmel, Kurt R.

    2002-08-01

    International SEMATECH (ISMT) is a consortium consisting of 13 leading semiconductor manufacturers from around the globe. Its objective is to develop the infrastructure necessary for its member companies to realize the International Technology Roadmap for Semiconductors (ITRS) through efficiencies of shared development resources and knowledge. The largest area of effort is lithography, recognized as a crucial enabler for microelectronics technology progress. Within the Lithography Division, most of the efforts center on mask-related issues. The development strategy at International SEMATCH will be presented and the interlock of lithography projects clarified. Because of the limited size of the mask production equipment market, the business case is weak for aggressive investment commensurate with the pace of the International Technology Roadmap for Semiconductors. With masks becoming the overwhelming component of lithography cost, new ways of reducing or eliminating mask costs are being explored. Will mask technology survive without a strong business case? Will the mask industry limit the growth of the semiconductor industry? Are advanced masks worth their escalating cost? An analysis of mask cost from the perspective of mask value imparted to the user is presented with examples and generic formulas for the reader to apply independently. A key part to the success for both International SEMATECH and the industry globally will be partnerships on both the local level between mask-maker and mask-user, and the macro level where global collaborations will be necessary to resolve technology development cost challenges.

  10. Masked object registration in the Fourier domain.

    Science.gov (United States)

    Padfield, Dirk

    2012-05-01

    Registration is one of the most common tasks of image analysis and computer vision applications. The requirements of most registration algorithms include large capture range and fast computation so that the algorithms are robust to different scenarios and can be computed in a reasonable amount of time. For these purposes, registration in the Fourier domain using normalized cross-correlation is well suited and has been extensively studied in the literature. Another common requirement is masking, which is necessary for applications where certain regions of the image that would adversely affect the registration result should be ignored. To address these requirements, we have derived a mathematical model that describes an exact form for embedding the masking step fully into the Fourier domain so that all steps of translation registration can be computed efficiently using Fast Fourier Transforms. We provide algorithms and implementation details that demonstrate the correctness of our derivations. We also demonstrate how this masked FFT registration approach can be applied to improve the Fourier-Mellin algorithm that calculates translation, rotation, and scale in the Fourier domain. We demonstrate the computational efficiency, advantages, and correctness of our algorithm on a number of images from real-world applications. Our framework enables fast, global, parameter-free registration of images with masked regions.

  11. What Is Being Masked in Object Substitution Masking?

    Science.gov (United States)

    Gellatly, Angus; Pilling, Michael; Cole, Geoff; Skarratt, Paul

    2006-01-01

    Object substitution masking (OSM) is said to occur when a perceptual object is hypothesized that is mismatched by subsequent sensory evidence, leading to a new hypothesized object being substituted for the first. For example, when a brief target is accompanied by a longer lasting display of nonoverlapping mask elements, reporting of target…

  12. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  13. Noggin and BMP4 co-modulate adult hippocampal neurogenesis in the APPswe/PS1ΔE9 transgenic mouse model of Alzheimer's disease

    International Nuclear Information System (INIS)

    In addition to the subventricular zone, the dentate gyrus of the hippocampus is one of the few brain regions in which neurogenesis continues into adulthood. Perturbation of neurogenesis can alter hippocampal function, and previous studies have shown that neurogenesis is dysregulated in Alzheimer disease (AD) brain. Bone morphogenetic protein-4 (BMP4) and its antagonist Noggin have been shown to play important roles both in embryonic development and in the adult nervous system, and may regulate hippocampal neurogenesis. Previous data indicated that increased expression of BMP4 mRNA within the dentate gyrus might contribute to decreased hippocampal cell proliferation in the APPswe/PS1ΔE9 mouse AD model. However, it is not known whether the BMP antagonist Noggin contributes to the regulation of neurogenesis. We therefore studied the relative expression levels and localization of BMP4 and its antagonist Noggin in the dentate gyrus and whether these correlated with changes in neurogenesis in 6-12 mo old APPswe/PS1ΔE9 transgenic mice. Bromodeoxyuridine (BrdU) was used to label proliferative cells. We report that decreased neurogenesis in the APP/PS1 transgenic mice was accompanied by increased expression of BMP4 and decreased expression of Noggin at both the mRNA and protein levels; statistical analysis showed that the number of proliferative cells at different ages correlated positively with Noggin expression and negatively with BMP4 expression. Intraventricular administration of a chimeric Noggin/Fc protein was used to block the action of endogenous BMP4; this resulted in a significant increase in the number of BrdU-labeled cells in dentate gyrus subgranular zone and hilus in APP/PS1 mice. These results suggest that BMP4 and Noggin co-modulate neurogenesis.

  14. A frequency and pulse-width co-modulation strategy for transcutaneous neuromuscular electrical stimulation based on sEMG time-domain features

    Science.gov (United States)

    Zhou, Yu-Xuan; Wang, Hai-Peng; Bao, Xue-Liang; Lü, Xiao-Ying; Wang, Zhi-Gong

    2016-02-01

    Objective. Surface electromyography (sEMG) is often used as a control signal in neuromuscular electrical stimulation (NMES) systems to enhance the voluntary control and proprioceptive sensory feedback of paralyzed patients. Most sEMG-controlled NMES systems use the envelope of the sEMG signal to modulate the stimulation intensity (current amplitude or pulse width) with a constant frequency. The aims of this study were to develop a strategy that co-modulates frequency and pulse width based on features of the sEMG signal and to investigate the torque-reproduction performance and the level of fatigue resistance achieved with our strategy. Approach. We examined the relationships between wrist torque and two stimulation parameters (frequency and pulse width) and between wrist torque and two sEMG time-domain features (mean absolute value (MAV) and number of slope sign changes (NSS)) in eight healthy volunteers. By using wrist torque as an intermediate variable, customized and generalized transfer functions were constructed to convert the two features of the sEMG signal into the two stimulation parameters, thereby establishing a MAV/NSS dual-coding (MNDC) algorithm. Wrist torque reproduction performance was assessed by comparing the torque generated by the algorithms with that originally recorded during voluntary contractions. Muscle fatigue was assessed by measuring the decline percentage of the peak torque and by comparing the torque time integral of the response to test stimulation trains before and after fatigue sessions. Main Results. The MNDC approach could produce a wrist torque that closely matched the voluntary wrist torque. In addition, a smaller decay in the wrist torque was observed after the MNDC-coded fatigue stimulation was applied than after stimulation using pulse-width modulation alone. Significance. Compared with pulse-width modulation stimulation strategies that are based on sEMG detection, the MNDC strategy is more effective for both voluntary muscle

  15. Masked Repetition Priming Using Magnetoencephalography

    Science.gov (United States)

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  16. Combining Simultaneous with Temporal Masking

    Science.gov (United States)

    Hermens, Frouke; Herzog, Michael H.; Francis, Gregory

    2009-01-01

    Simultaneous and temporal masking are two frequently used techniques in psychology and vision science. Although there are many studies and theories related to each masking technique, there are no systematic investigations of their mutual relationship, even though both techniques are often applied together. Here, the authors show that temporal…

  17. Mask registration and wafer overlay

    Science.gov (United States)

    Lee, Chulseung; Bang, Changjin; Kim, Myoungsoo; Kang, Hyosang; Lee, Dohwa; Jeong, Woonjae; Lim, Ok-Sung; Yoon, Seunghoon; Jung, Jaekang; Laske, Frank; Parisoli, Lidia; Roeth, Klaus-Dieter; Robinson, John C.; Jug, Sven; Izikson, Pavel; Dinu, Berta; Widmann, Amir; Choi, DongSub

    2010-03-01

    Overlay continues to be one of the key challenges for lithography in advanced semiconductor manufacturing. It becomes even more challenging due to the continued shrinking of the device node. Some low k1 techniques, such as Double Exposure and Double Patterning also add additional loss of the overlay margin due to the fact that the single layer pattern is created based on more than 1 exposure. Therefore, the overlay between 2 exposures requires very tight overlay specification. Mask registration is one of the major contributors to wafer overlay, especially field related overlay. We investigated mask registration and wafer overlay by co-analyzing the mask data and the wafer overlay data. To achieve the accurate cohesive results, we introduced the combined metrology mark which can be used for both mask registration measurement as well as for wafer overlay measurement. Coincidence of both metrology marks make it possible to subtract mask signature from wafer overlay without compromising the accuracy due to the physical distance between measurement marks, if we use 2 different marks for both metrologies. Therefore, it is possible to extract pure scanner related signatures, and to analyze the scanner related signatures in details to in order to enable root cause analysis and ultimately drive higher wafer yield. We determined the exact mask registration error in order to decompose wafer overlay into mask, scanner, process and metrology. We also studied the impact of pellicle mounting by comparison of mask registration measurement pre-pellicle mounting and post-pellicle mounting in this investigation.

  18. Hg-Mask Coronagraph

    Science.gov (United States)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  19. Mask roughness induced LER: a rule of thumb -- paper

    Energy Technology Data Exchange (ETDEWEB)

    McClinton, Brittany; Naulleau, Patrick

    2010-03-12

    Much work has already been done on how both the resist and line-edge roughness (LER) on the mask affect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and currently factor into LER limits. Here, we propose a 'rule-of-thumb' simplified solution that provides a fast and powerful method to obtain mask roughness induced LER. We present modeling data on an older generation mask with a roughness of 230 pm as well as the ultimate target roughness of 50 pm. Moreover, we consider feature sizes of 50 nm and 22 nm, and show that as a function of correlation length, the LER peaks at the condition that the correlation length is approximately equal to the resolution of the imaging optic.

  20. Fabless company mask technology approach: fabless but not fab-careless

    Science.gov (United States)

    Hisamura, Toshiyuki; Wu, Xin

    2009-10-01

    There are two different foundry-fabless working models in the aspect of mask. Some foundries have in-house mask facility while others contract with merchant mask vendors. Significant progress has been made in both kinds of situations. Xilinx as one of the pioneers of fabless semiconductor companies has been continually working very closely with both merchant mask vendors and mask facilities of foundries in past many years, contributed well in both technology development and benefited from corporations. Our involvement in manufacturing is driven by the following three elements: The first element is to understand the new fabrication and mask technologies and then find a suitable design / layout style to better utilize these new technologies and avoid potential risks. Because Xilinx has always been involved in early stage of advanced technology nodes, this early understanding and adoption is especially important. The second element is time to market. Reduction in mask and wafer manufacturing cycle-time can ensure faster time to market. The third element is quality. Commitment to quality is our highest priority for our customers. We have enough visibility on any manufacturing issues affecting the device functionality. Good correlation has consistently been observed between FPGA speed uniformity and the poly mask Critical Dimension (CD) uniformity performance. To achieve FPGA speed uniformity requirement, the manufacturing process as well as the mask and wafer CD uniformity has to be monitored. Xilinx works closely with the wafer foundries and mask suppliers to improve productivity and the yield from initial development stage of mask making operations. As an example, defect density reduction is one of the biggest challenges for mask supplier in development stage to meet the yield target satisfying the mask cost and mask turn-around-time (TAT) requirement. Historically, masks were considered to be defect free but at these advanced process nodes, that assumption no longer

  1. Source Separation via Spectral Masking for Speech Recognition Systems

    Directory of Open Access Journals (Sweden)

    Gustavo Fernandes Rodrigues

    2012-12-01

    Full Text Available In this paper we present an insight into the use of spectral masking techniques in time-frequency domain, as a preprocessing step for the speech signal recognition. Speech recognition systems have their performance negatively affected in noisy environments or in the presence of other speech signals. The limits of these masking techniques for different levels of the signal-to-noise ratio are discussed. We show the robustness of the spectral masking techniques against four types of noise: white, pink, brown and human speech noise (bubble noise. The main contribution of this work is to analyze the performance limits of recognition systems  using spectral masking. We obtain an increase of 18% on the speech hit rate, when the speech signals were corrupted by other speech signals or bubble noise, with different signal-to-noise ratio of approximately 1, 10 and 20 dB. On the other hand, applying the ideal binary masks to mixtures corrupted by white, pink and brown noise, results an average growth of 9% on the speech hit rate, with the same different signal-to-noise ratio. The experimental results suggest that the masking spectral techniques are more suitable for the case when it is applied a bubble noise, which is produced by human speech, than for the case of applying white, pink and brown noise.

  2. Self-Rescue Mask Training

    CERN Multimedia

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  3. Informational masking and musical training.

    Science.gov (United States)

    Oxenham, Andrew J; Fligor, Brian J; Mason, Christine R; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  4. Informational masking and musical training

    Science.gov (United States)

    Oxenham, Andrew J.; Fligor, Brian J.; Mason, Christine R.; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  5. Periodontal Side Effect During Orthopedic Face Mask Therapy.

    Science.gov (United States)

    Incerti-Parenti, Serena; Checchi, Vittorio; Molinari, Camilla; Alessandri-Bonetti, Giulio

    2015-01-01

    A 7-year-old patient exhibited gingival recession of tooth #41 and severe plaque accumulation after 3 months of face mask therapy. The recession improved only slightly after appropriate oral hygiene instructions and motivation. Decisive improvement began when the vertical chin pad extension was reduced to avoid pressure on the affected area. PMID:27029093

  6. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan;

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...

  7. TASTE MASKING METHODS AND AGENTS IN PHARMACEUTICAL FORMULATIONS

    Directory of Open Access Journals (Sweden)

    Mirajkar Reshma Nilesh

    2012-08-01

    Full Text Available Taste is a critical factor during development of any dosage form and it is important parameter in administering drugs orally. Undesirable and particularly bitter taste is one of the important formulation problems that are encountered with many drugs. Proven methods for bitterness reduction and inhibition have resulted in improved palatability of oral pharmaceuticals. The present review explains in detail the various methods and agents used for taste-masking like, Inclusion complexation, Ion exchange resin, Coating, Granulation, Microencapsulation, Flavors, and Sweeteners, Pro-drug etc.The review also highlights factors affecting the selection of technology for taste masking and methods for evaluation of taste.

  8. Investigation of Anode Striation in 34VGA Shadow Mask PDP

    Institute of Scientific and Technical Information of China (English)

    TU Yan; JIANG Youyan; YANG Lanlan; ZHANG Xiong; WANG Baoping

    2007-01-01

    A macro-cell was used to study the phenomenon of anode striation on a 34 VGA Shadow Mask Plasma Display Panel(SMPDP).The breakdown process in the sustaining period of the macro-cell was taken by an Intensified Charge Coupled Device(ICCD)with narrow band filters.The mechanism of formation and evolution of the anode striation on SMPDP were investigated.The influence of the width of the electrode,the sustaining voltage,sustaining frequency and the voltage of the shadow mask on the anode striation was also studied.The results showed that the width of the electrodes,the sustaining voltage and frequency had a strong influence on the anode striation.The voltage of the shadow mask,however,hardly affected the anode striation,the firing voltage or the sustaining voltage.

  9. Effect of Mask Regions on Weak Lensing Statistics

    CERN Document Server

    Shirasaki, Masato; Hamana, Takashi

    2013-01-01

    Sky masking is unavoidable in wide-field weak lensing observations. We study how masks affect the measurement of statistics of matter distribution probed by weak gravitational lensing. We first use 1000 Gaussian simulations in order to examine in detail the impact of mask regions on the weak lensing Minkowski Functionals (MFs). We consider actual sky masks used for a Subaru Suprime-Cam imaging survey. The masks increase the variance of the convergence field and thus the expected values of the MFs are biased even for a Gaussian random field. The bias is caused by two effects. One is owing to the reduced number of sampling Fourier modes, which can be accounted for analytically by considering the survey geometry appropriately. The other is owing to variation of the variance of the convergence field for each field of view. Lensing MFs are biased systematically when the reconstructed convergence field is normalized by its variance. We then use a large number of cosmological ray-tracing simulations in order to addr...

  10. Mask qualification strategies in a wafer fab

    Science.gov (United States)

    Jaehnert, Carmen; Kunowski, Angela

    2007-02-01

    Having consistent high quality photo masks is one of the key factors in lithography in the wafer fab. Combined with stable exposure- and resist processes, it ensures yield increases in production and fast learning cycles for technology development and design evaluation. Preventive controlling of incoming masks and quality monitoring while using the mask in production is essential for the fab to avoid yield loss or technical problems caused by mask issues, which eventually result in delivery problems to the customer. In this paper an overview of the procedures used for mask qualification and production release, for both logic and DRAM, at Infineon Dresden is presented. Incoming qualification procedures, such as specification checks, incoming inspection, and inline litho process window evaluation, are described here. Pinching and electrical tests, including compatibility tests for mask copies for high volume products on optimized litho processes, are also explained. To avoid mask degradation over lifetime, re-inspection checks are done for re-qualification while using the mask in production. The necessity of mask incoming inspection and re-qualification, due to the repeater printing from either the processing defects of the original mask or degrading defects of being used in the fab (i.e. haze, ESD, and moving particles, etc.), is demonstrated. The need and impact of tight mask specifications, such as CD uniformity signatures and corresponding electrical results, are shown with examples of mask-wafer CD correlation.

  11. 47 CFR 90.210 - Emission masks.

    Science.gov (United States)

    2010-10-01

    ... 47 Telecommunication 5 2010-10-01 2010-10-01 false Emission masks. 90.210 Section 90.210... MOBILE RADIO SERVICES General Technical Standards § 90.210 Emission masks. Except as indicated elsewhere... emission masks outlined in this section. Unless otherwise stated, per paragraphs (d)(4), (e)(4), and (m)...

  12. 21 CFR 868.5580 - Oxygen mask.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oxygen mask. 868.5580 Section 868.5580 Food and... ANESTHESIOLOGY DEVICES Therapeutic Devices § 868.5580 Oxygen mask. (a) Identification. An oxygen mask is a device placed over a patient's nose, mouth, or tracheostomy to administer oxygen or aerosols. (b)...

  13. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    In this paper we present a new approach for binary and soft masks used in single-channel speech separation. We present a novel approach called the sinusoidal mask (binary mask and Wiener filter) in a sinusoidal space. Theoretical analysis is presented for the proposed method, and we show that the...

  14. Serotonin dependent masking of hippocampal sharp wave ripples.

    Science.gov (United States)

    ul Haq, Rizwan; Anderson, Marlene L; Hollnagel, Jan-Oliver; Worschech, Franziska; Sherkheli, Muhammad Azahr; Behrens, Christoph J; Heinemann, Uwe

    2016-02-01

    Sharp wave ripples (SPW-Rs) are thought to play an important role in memory consolidation. By rapid replay of previously stored information during slow wave sleep and consummatory behavior, they result from the formation of neural ensembles during a learning period. Serotonin (5-HT), suggested to be able to modify SPW-Rs, can affect many neurons simultaneously by volume transmission and alter network functions in an orchestrated fashion. In acute slices from dorsal hippocampus, SPW-Rs can be induced by repeated high frequency stimulation that induces long-lasting LTP. We used this model to study SPW-R appearance and modulation by 5-HT. Although stimulation in presence of 5-HT permitted LTP induction, SPW-Rs were "masked"--but appeared after 5-HT wash-out. This SPW-R masking was dose dependent with 100 nM 5-HT being sufficient--if the 5-HT re-uptake inhibitor citalopram was present. Fenfluramine, a serotonin releaser, could also mask SPW-Rs. Masking was due to 5-HT1A and 5-HT2A/C receptor activation. Neither membrane potential nor membrane conductance changes in pyramidal cells caused SPW-R blockade since both remained unaffected by combining 5-HT and citalopram. Moreover, 10 and 30 μM 5-HT mediated SPW-R masking preceded neuronal hyperpolarization and involved reduced presynaptic transmitter release. 5-HT, as well as a 5-HT1A agonist, augmented paired pulse facilitation and affected the coefficient of variance. Spontaneous SPW-Rs in mice hippocampal slices were also masked by 5-HT and fenfluramine. While neuronal ensembles can acquire long lasting LTP during higher 5-HT levels, lower 5-HT levels enable neural ensembles to replay previously stored information and thereby permit memory consolidation memory. PMID:26409781

  15. Shadows alter facial expressions of Noh masks.

    Directory of Open Access Journals (Sweden)

    Nobuyuki Kawai

    Full Text Available BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressions. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, neutral-faced Noh masks having the attached shadows of the happy/sad masks were recognized as bearing happy/sad expressions, respectively. This was true for all four types of masks each of which represented a character differing in sex and age, even though the original characteristics of the masks also greatly influenced the evaluation of emotions. Experiment 2 further revealed that frontal Noh mask images having shadows of upward/downward tilted masks were evaluated as sad/happy, respectively. This was consistent with outcomes from preceding studies using actually tilted Noh mask images. CONCLUSIONS/SIGNIFICANCE: Results from the two experiments concur that purely manipulating attached shadows of the different types of Noh masks significantly alters the emotion recognition. These findings go in line with the mysterious facial expressions observed in Western paintings, such as the elusive qualities of Mona Lisa's smile. They also agree with the aesthetic principle of Japanese traditional art "yugen (profound grace and subtlety", which highly appreciates subtle emotional expressions in the darkness.

  16. Process capability of etched multilayer EUV mask

    Science.gov (United States)

    Takai, Kosuke; Iida nee Sakurai, Noriko; Kamo, Takashi; Morikawa, Yasutaka; Hayashi, Naoya

    2015-10-01

    With shrinking pattern size at 0.33NA EUV lithography systems, mask 3D effects are expected to become stronger, such as horizontal/vertical shadowing, best focus shifts through pitch and pattern shift through focus. Etched multilayer EUV mask structures have been proposed in order to reduce mask 3D effects. It is estimated that etched multilayer type mask is also effective in reducing mask 3D effects at 0.33NA with lithographic simulation, and it is experimentally demonstrated with NXE3300 EUV Lithography system. We obtained cross-sectional TEM image of etched multilayer EUV mask pattern. It is observed that patterned multilayer width differs from pattern physical width. This means that effective reflecting width of etched multilayer pattern is smaller than pattern width measured by CD-SEM. In this work, we evaluate mask durability against both chemical and physical cleaning process to check the feasibility of etched multilayer EUV mask patterning against mask cleaning for 0.33NA EUV extension. As a result, effective width can be controlled by suitable cleaning chemicals because sidewall film works as a passivation film. And line and space pattern collapse is not detected by DUV mask pattern inspection tool after mask physical cleaning that includes both megasonic and binary spray steps with sufficient particle removal efficiency.

  17. Mask CD uniformity improvement by electron scanning exposure based Global Loading Effect Correction

    Science.gov (United States)

    Li, Rivan; Tian, Eric; Shi, Irene; Guo, Eric; Lu, Max

    2015-07-01

    Critical Dimension (CD) Uniformity is one of the necessary parameters to assure good performance and reliable functionality of any integrated circuit (IC), and towards the advanced technology node 28nm and beyond, corresponding CD Uniformity becomes more and more crucial. It is found that bad mask CD Uniformity is a significant error source at 28nm process. The CD Uniformity on mask, if not controlled well, will badly impact wafer CD performance, and it has been well-studied that CD Uniformity issue from gate line-width in transistors would affect the device performance directly. In this paper we present a novel solution for mask global CD uniformity error correction, which is called as global loading effect correction (GLEC) method and applied nesting in the mask exposure map during the electron beam exposure. There are factors such as global chip layout, writing sequence and chip pattern density distribution (Global Loading), that work on the whole mask CD Uniformity, especially Global Loading is the key factor related to mask global CD error. From our experimental results, different pattern density distribution on mask significantly influenced the final mask CD Uniformity: the mask with undulating pattern density distribution provides much worse CD Uniformity than that with uniform one. Therefore, a GLEC model based on pattern density has been created to compensate the global error during the electron beam exposure, which has been proved to be efficacious to improve mask global CD Uniformity performance. Furthermore, it 's also revealed that pattern type is another important impact factor, and GLEC coefficient need be modified due to the specific pattern type (e.g. dense line-space only, iso-space only or an average of them) to improve the corresponding mask CD uniformity.

  18. Shadows Alter Facial Expressions of Noh Masks

    OpenAIRE

    Nobuyuki Kawai; Hiromitsu Miyata; Ritsuko Nishimura; Kazuo Okanoya

    2013-01-01

    BACKGROUND: A Noh mask, worn by expert actors during performance on the Japanese traditional Noh drama, conveys various emotional expressions despite its fixed physical properties. How does the mask change its expressions? Shadows change subtly during the actual Noh drama, which plays a key role in creating elusive artistic enchantment. We here describe evidence from two experiments regarding how attached shadows of the Noh masks influence the observers' recognition of the emotional expressio...

  19. Temporal processes involved in simultaneous reflection masking

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2006-01-01

    Reflection masking refers to the specific masking condition where a test reflection is masked by the direct sound. Employing reflection masking techniques, Buchholz [J. Acoust. Soc. Am. 117, 2484 (2005)] provided evidence that the binaural system suppresses the test reflection for very short...... reflection delays and enhances the test reflection for large delays. Employing a 200-ms-long broadband noise burst as input signal, the critical delay separating these two binaural phenomena was found to be 7–10 ms. It was suggested that the critical delay refers to a temporal window that is employed...

  20. Computational defect review for actinic mask inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram

    2013-04-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The limitation of 1.35 NA posed by water-based lithography has led to the application of various resolution enhancement techniques (RET), for example, use of strong phase-shifting masks, aggressive OPC and sub-resolution assist features, customized illuminators, etc. The adoption of these RET techniques combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for a mask inspection engineer. Inspecting masks under their actinic-aerial image conditions would detect defects that are more likely to print under those exposure conditions. However, this also makes reviewing such defects in their low-contrast aerial images very challenging. On the other hand, inspecting masks under higher resolution inspection optics would allow for better viewing of defects post-inspection. However, such inspections generally would also detect many more defects, including printable and nuisance, thereby making it difficult to judge which are of real concern for printability on wafer. Often, an inspection engineer may choose to use Aerial and/or high resolution inspection modes depending on where in the process flow the mask is and the specific device-layer characteristics of the mask. Hence, a comprehensive approach is needed in handling defects both post-aerial and post-high resolution inspections. This analysis system is designed for the Applied Materials Aera™ mask inspection platform, all data reported was collected using the Aera.

  1. Determination of mask induced polarization effects on AltPSM mask structures

    Science.gov (United States)

    Hollein, Ingo; Teuber, Silvio; Bubke, Karsten

    2005-06-01

    In the process of discussion of possible mask-types for the 5x nm node (half-pitch) and below, the alternating phase-shifting mask (AltPSM) is a potential candidate to be screened. The current scenario suggests using 193 nm immersion lithography with NA values of up to 1.2 and above. New optical effects from oblique incident angles, mask-induced polarization of the transmitted light and birefringence from the substrate need to be taken into account when the optical performance of a mask is evaluated. This paper addresses mask induced polarization effects from dense lines-and-space structures on a real mask. Measurements of the polarization dependent diffraction efficiencies have been performed on AltPSM masks. Experimental results show good agreement with simulations. A comparison with Binary Masks is made.

  2. Comparative study of manufacturing techniques for coronagraphic binary pupil masks: masks on substrates and free-standing masks

    CERN Document Server

    Enya, Keigo; Kotani, Takayuki; Abe, Lyu

    2012-01-01

    We present a comparative study of the manufacture of binary pupil masks for coronagraphic observations of exoplanets. A checkerboard mask design, a type of binary pupil mask design, was adopted, and identical patterns of the same size were used for all the masks in order that we could compare the differences resulting from the different manufacturing methods. The masks on substrates had aluminum checkerboard patterns with thicknesses of 0.1/0.2/0.4/0.8/1.6$\\mu$m constructed on substrates of BK7 glass, silicon, and germanium using photolithography and chemical processes. Free-standing masks made of copper and nickel with thicknesses of 2/5/10/20$\\mu$m were also realized using photolithography and chemical processes, which included careful release from the substrate used as an intermediate step in the manufacture. Coronagraphic experiments using a visible laser were carried out for all the masks on BK7 glass substrate and the free-standing masks. The average contrasts were 8.4$\\times10^{-8}$, 1.2$\\times10^{-7}$...

  3. Fast mask writers: technology options and considerations

    Science.gov (United States)

    Litt, Lloyd C.; Groves, Timothy; Hughes, Greg

    2011-04-01

    The semiconductor industry is under constant pressure to reduce production costs even as the complexity of technology increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which have added to the complexity of making masks because of the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low-k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that funding on the order of 50M to 90M for non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development poses a high risk for an individual supplier. The structure of the mask fabrication marketplace separates the mask writer equipment customer (the mask supplier) from the final customer (wafer manufacturer) that will be most effected by the increase in mask cost that will result if a high speed mask writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed.

  4. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  5. Computing Challenges in Coded Mask Imaging

    Science.gov (United States)

    Skinner, Gerald

    2009-01-01

    This slide presaentation reviews the complications and challenges in developing computer systems for Coded Mask Imaging telescopes. The coded mask technique is used when there is no other way to create the telescope, (i.e., when there are wide fields of view, high energies for focusing or low energies for the Compton/Tracker Techniques and very good angular resolution.) The coded mask telescope is described, and the mask is reviewed. The coded Masks for the INTErnational Gamma-Ray Astrophysics Laboratory (INTEGRAL) instruments are shown, and a chart showing the types of position sensitive detectors used for the coded mask telescopes is also reviewed. Slides describe the mechanism of recovering an image from the masked pattern. The correlation with the mask pattern is described. The Matrix approach is reviewed, and other approaches to image reconstruction are described. Included in the presentation is a review of the Energetic X-ray Imaging Survey Telescope (EXIST) / High Energy Telescope (HET), with information about the mission, the operation of the telescope, comparison of the EXIST/HET with the SWIFT/BAT and details of the design of the EXIST/HET.

  6. A mask manufacturer's perspective on maskless lithography

    Science.gov (United States)

    Buck, Peter; Biechler, Charles; Kalk, Franklin

    2005-11-01

    Maskless Lithography (ML2) is again being considered for use in mainstream CMOS IC manufacturing. Sessions at technical conferences are being devoted to ML2. A multitude of new companies have been formed in the last several years to apply new concepts to breaking the throughput barrier that has in the past prevented ML2 from achieving the cost and cycle time performance necessary to become economically viable, except in rare cases. Has Maskless Lithography's (we used to call it "Direct Write Lithography") time really come? If so, what is the expected impact on the mask manufacturer and does it matter? The lithography tools used today in mask manufacturing are similar in concept to ML2 except for scale, both in throughput and feature size. These mask tools produce highly accurate lithographic images directly from electronic pattern files, perform multi-layer overlay, and mix-n-match across multiple tools, tool types and sites. Mask manufacturers are already accustomed to the ultimate low volume - one substrate per design layer. In order to achieve the economically required throughput, proposed ML2 systems eliminate or greatly reduce some of the functions that are the source of the mask writer's accuracy. Can these ML2 systems meet the demanding lithographic requirements without these functions? ML2 may eliminate the reticle but many of the processes and procedures performed today by the mask manufacturer are still required. Examples include the increasingly complex mask data preparation step and the verification performed to ensure that the pattern on the reticle is accurately representing the design intent. The error sources that are fixed on a reticle are variable with time on an ML2 system. It has been proposed that if ML2 is successful it will become uneconomical to be in the mask business - that ML2, by taking the high profit masks will take all profitability out of mask manufacturing and thereby endanger the entire semiconductor industry. Others suggest that a

  7. Masking property of quantum random cipher with phase mask encryption

    Science.gov (United States)

    Sohma, Masaki; Hirota, Osamu

    2014-10-01

    The security analysis of physical encryption protocol based on coherent pulse position modulation (CPPM) originated by Yuen is one of the most interesting topics in the study of cryptosystem with a security level beyond the Shannon limit. Although the implementation of CPPM scheme has certain difficulty, several methods have been proposed recently. This paper deals with the CPPM encryption in terms of symplectic transformation, which includes a phase mask encryption as a special example, and formulates a unified security analysis for such encryption schemes. Specifically, we give a lower bound of Eve's symbol error probability using reliability function theory to ensure that our proposed system exceeds the Shannon limit. Then we assume the secret key is given to Eve after her heterodyne measurement. Since this assumption means that Eve has a great advantage in the sense of the conventional cryptography, the lower bound of her error indeed ensures the security level beyond the Shannon limit. In addition, we show some numerical examples of the security performance.

  8. Space and time in masking and crowding.

    Science.gov (United States)

    Lev, Maria; Polat, Uri

    2015-01-01

    Masking and crowding are major phenomena associated with contextual modulations, but the relationship between them remains unclear. We have recently shown that crowding is apparent in the fovea when the time available for processing is limited, pointing to the strong relationship between crowding in the spatial and temporal domains. Models of crowding emphasize the size (acuity) of the target and the spacing between the target and flankers as the main determinants that predict crowding. Our model, which is based on lateral interactions, posits that masking and crowding are related in the spatial and temporal domains at the fovea and periphery and that both can be explained by the increasing size of the human perceptive field (PF) with increasing eccentricity. We explored the relations between masking and crowding using letter identification and contrast detection by correlating the crowding effect with the estimated size of the PF and with masking under different spatiotemporal conditions. We found that there is a large variability in PF size and crowding effects across observers. Nevertheless, masking and crowding were both correlated with the estimated size of the PF in the fovea and periphery under a specific range of spatiotemporal parameters. Our results suggest that under certain conditions, crowding and masking share common neural mechanisms that underlie the spatiotemporal properties of these phenomena in both the fovea and periphery. These results could explain the transfer of training gains from spatiotemporal Gabor masking to letter acuity, reading, and reduced crowding.

  9. Printed shadow masks for organic transistors

    Science.gov (United States)

    Noguchi, Yoshiaki; Sekitani, Tsuyoshi; Someya, Takao

    2007-09-01

    We have manufactured organic field-effect transistors by using shadow masks that are patterned by a screen printing system. The 50-nm-thick pentacene layer is sublimed as a channel in the vacuum system through the shadow mask on the base film with a multilayer patterned by ink-jet. After the deposition of the pentacene layer, the shadow mask is peeled off from the base film without any mechanical damages to the lower structures. The mobility in the saturation regime is 0.4cm2/Vs and the on-off ratio exceeds 105.

  10. Noggin and BMP4 co-modulate adult hippocampal neurogenesis in the APP{sub swe}/PS1{sub {Delta}E9} transgenic mouse model of Alzheimer's disease

    Energy Technology Data Exchange (ETDEWEB)

    Tang, Jun [Department of Medical Genetics, Third Military Medical University, Chongqing 400038 (China); Department of Physiology, Third Military Medical University, Chongqing 400038 (China); Song, Min; Wang, Yanyan [Department of Medical Genetics, Third Military Medical University, Chongqing 400038 (China); Fan, Xiaotang [Department of Histology and Embryology, Third Military Medical University, Chongqing 400038 (China); Xu, Haiwei, E-mail: haiweixu2001@yahoo.com.cn [Department of Physiology, Third Military Medical University, Chongqing 400038 (China); Bai, Yun, E-mail: baiyungene@gmail.com [Department of Medical Genetics, Third Military Medical University, Chongqing 400038 (China)

    2009-07-31

    In addition to the subventricular zone, the dentate gyrus of the hippocampus is one of the few brain regions in which neurogenesis continues into adulthood. Perturbation of neurogenesis can alter hippocampal function, and previous studies have shown that neurogenesis is dysregulated in Alzheimer disease (AD) brain. Bone morphogenetic protein-4 (BMP4) and its antagonist Noggin have been shown to play important roles both in embryonic development and in the adult nervous system, and may regulate hippocampal neurogenesis. Previous data indicated that increased expression of BMP4 mRNA within the dentate gyrus might contribute to decreased hippocampal cell proliferation in the APP{sub swe}/PS1{sub {Delta}E9} mouse AD model. However, it is not known whether the BMP antagonist Noggin contributes to the regulation of neurogenesis. We therefore studied the relative expression levels and localization of BMP4 and its antagonist Noggin in the dentate gyrus and whether these correlated with changes in neurogenesis in 6-12 mo old APP{sub swe}/PS1{sub {Delta}E9} transgenic mice. Bromodeoxyuridine (BrdU) was used to label proliferative cells. We report that decreased neurogenesis in the APP/PS1 transgenic mice was accompanied by increased expression of BMP4 and decreased expression of Noggin at both the mRNA and protein levels; statistical analysis showed that the number of proliferative cells at different ages correlated positively with Noggin expression and negatively with BMP4 expression. Intraventricular administration of a chimeric Noggin/Fc protein was used to block the action of endogenous BMP4; this resulted in a significant increase in the number of BrdU-labeled cells in dentate gyrus subgranular zone and hilus in APP/PS1 mice. These results suggest that BMP4 and Noggin co-modulate neurogenesis.

  11. Actinic review of EUV masks

    Science.gov (United States)

    Feldmann, Heiko; Ruoff, Johannes; Harnisch, Wolfgang; Kaiser, Winfried

    2010-04-01

    Management of mask defects is a major challenge for the introduction of EUV for HVM production. Once a defect has been detected, its printing impact needs to be predicted. Potentially the defect requires some repair, the success of which needs to be proven. This defect review has to be done with an actinic inspection system that matches the imaging conditions of an EUV scanner. During recent years, several concepts for such an aerial image metrology system (AIMS™) have been proposed. However, until now no commercial solution exists for EUV. Today, advances in EUV optics technology allow envisioning a solution that has been discarded before as unrealistic. We present this concept and its technical cornerstones.While the power requirement for the EUV source is less demanding than for HVM lithography tools, radiance, floor space, and stability are the main criteria for source selection. The requirement to emulate several generations of EUV scanners demands a large flexibility for the ilumination and imaging systems. New critical specifications to the EUV mirrors in the projection microscope can be satisfied using our expertise from lithographic mirrors. In summary, an EUV AIMS™ meeting production requirements seems to be feasible.

  12. The Effects of Noise Masking and Required Accuracy on Speech Errors, Disfluencies, and Self-Repairs.

    Science.gov (United States)

    Postma, Albert; Kolk, Herman

    1992-01-01

    This study, involving 32 adult speakers of Dutch, strengthens the covert repair hypothesis of disfluency. It found that emphasis on speech accuracy causes lower speech error rates but does not affect disfluency and self-repair rates, noise masking reduces disfluency and self-repair rates but does not affect speech error numbers, and internal…

  13. Suppression of Mirror Generalization for Reversible Letters: Evidence from Masked Priming

    Science.gov (United States)

    Perea, Manuel; Moret-Tatay, Carmen; Panadero, Victoria

    2011-01-01

    Readers of the Roman script must "unlearn" some forms of mirror generalization when processing printed stimuli (i.e., herb and herd are different words). Here we examine whether the suppression of mirror generalization is a process that affects all letters or whether it mostly affects reversible letters (i.e., b/d). Three masked priming lexical…

  14. Neurofibromatosis: relinquishing the masks; a quest for quality of life.

    Science.gov (United States)

    Messner, R; Smith, M N

    1986-07-01

    Neurofibromatosis (NF) or von Recklinghausen's disease is mankind's most common neurologic genetic disorder, occurring in one of every 3000 live births. While many individuals with NF suffer disfiguring, disabling, or life-threatening complications, NF is extremely variable in its symptoms, intensity, and progression. For many of its victims, NF is a pseudonym for uncertainty and physical and psychosocial havoc. John Merrick, 'The Elephant Man', endured one of the most severe cases of NF ever recorded. Merrick's rejection by post-Dickensian England forced him to become a sideshow circus attraction just to survive. The essence of nursing intervention with NF patients and their families engaged in the quest for quality of life is to restore them to optimal physical and psychosocial functioning, and, ideally, to help them utilize the experience for growth. Many individuals respond to the frustration of NF and society's reactions to the disorder by the wearing of psychological masks. Likewise, nurses may wear emotional masks as a defence against their own discomfort and fears concerning the disorders. Comprehensive nursing management of NF is realized only as nurses and patients relinquish their respective masks. This article examines the nurse's role in genetic disorders with special considerations presented by NF. Adaptation to NF involves coping with NF and its accompanying sequelae and coping with life as it is affected by NF. The concepts of 'chromosomal coping', 'genetophobia', 'genetic guilt, and 'genetic overload syndrome' are presented and analyzed utilizing the theoretical nursing frameworks of Imogene King and Sister Callista Roy.

  15. In-flight calibration of the INTEGRAL/IBIS mask

    CERN Document Server

    Soldi, S; Gros, A; Belanger, G; Beckmann, V; Caballero, I; Goldwurm, A; Gotz, D; Mattana, F; Heras, J A Zurita; Bazzano, A; Ubertini, P

    2013-01-01

    Since the release of the INTEGRAL Offline Scientific Analysis (OSA) software version 9.0, the ghost busters module has been introduced in the INTEGRAL/IBIS imaging procedure, leading to an improvement of the sensitivity around bright sources up to a factor of 7. This module excludes in the deconvolution process the IBIS/ISGRI detector pixels corresponding to the projection of a bright source through mask elements affected by some defects. These defects are most likely associated with screws and glue fixing the IBIS mask to its support. Following these major improvements introduced in OSA 9, a second order correction is still required to further remove the residual noise, now at a level of 0.2-1% of the brightest source in the field of view. In order to improve our knowledge of the IBIS mask transparency, a calibration campaign has been carried out during 2010-2012. We present here the analysis of these data, together with archival observations of the Crab and Cyg X-1, that allowed us to build a composite imag...

  16. Thorough characterization of a EUV mask

    Energy Technology Data Exchange (ETDEWEB)

    Mizuno, H.; McIntyre, G.; Koay, C.-W.; Burkhardt, M.; He, L.; Hartley, J.; Johnson, C.; Raghunathan, S.; Goldberg, K.; Mochi, I.; La Fontaine, B.; Wood, O.

    2009-06-25

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT). In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics, The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements, However, the resist printing results for the isolated space patterns are slightly different. The cause ofthis discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT, The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  17. Role of mask in asian shamanism

    OpenAIRE

    POVALYASHKO GALINA; ABAYEVA SABINA

    2015-01-01

    In the article there is considered a phenomena of shamanism as a cultural universal. Analysis object is a clay mask of National Museum of the Republic of Kazakhstan. It was found in Keder settlement (Kuiryktobe), located in Otrar Oasis at one of the most busy part of the Silk Road. The mask as shamanistic ritual attribute is considered as an obligatory condition for meditative function of shaman.

  18. Phase mask coronagraphy at JPL and Palomar

    Directory of Open Access Journals (Sweden)

    Serabyn E.

    2011-07-01

    Full Text Available For the imaging of faint companions, phase mask coronagraphy has the dual advantages of a small inner working angle and high throughput. This paper summarizes our recent work in developing phase masks and in demonstrating their capabilities at JPL. Four-quadrant phase masks have been manufactured at JPL by means of both evaporation and etching, and we have been developing liquid crystal vortex phase masks in partnership with a commercial vendor. Both types of mask have been used with our extreme adaptive optics well-corrected subaperture at Palomar to detect known brown dwarf companions as close as ~ 2.5 λ/D to stars. Moreover, our recent vortex masks perform very well in laboratory tests, with a demonstrated infrared contrast of about 10−6 at 3 λ/D, and contrasts of a few 10−7 with an initial optical wavelength device. The demonstrated performance already meets the needs of ground-based extreme adaptive optics coronagraphy, and further planned improvements are aimed at reaching the 10−10 contrast needed for terrestrial exoplanet detection with a space-based coronagraph.

  19. VSP wave separation by adaptive masking filters

    Science.gov (United States)

    Rao, Ying; Wang, Yanghua

    2016-06-01

    In vertical seismic profiling (VSP) data processing, the first step might be to separate the down-going wavefield from the up-going wavefield. When using a masking filter for VSP wave separation, there are difficulties associated with two termination ends of the up-going waves. A critical challenge is how the masking filter can restore the energy tails, the edge effect associated with these terminations uniquely exist in VSP data. An effective strategy is to implement masking filters in both τ-p and f-k domain sequentially. Meanwhile it uses a median filter, producing a clean but smooth version of the down-going wavefield, used as a reference data set for designing the masking filter. The masking filter is implemented adaptively and iteratively, gradually restoring the energy tails cut-out by any surgical mute. While the τ-p and the f-k domain masking filters target different depth ranges of VSP, this combination strategy can accurately perform in wave separation from field VSP data.

  20. Mask cost of ownership for advanced lithography

    Science.gov (United States)

    Muzio, Edward G.; Seidel, Philip K.

    2000-07-01

    As technology advances, becoming more difficult and more expensive, the cost of ownership (CoO) metric becomes increasingly important in evaluating technical strategies. The International SEMATECH CoC analysis has steadily gained visibility over the past year, as it attempts to level the playing field between technology choices, and create a fair relative comparison. In order to predict mask cots for advanced lithography, mask process flows are modeled using bets-known processing strategies, equipment cost, and yields. Using a newly revised yield mode, and updated mask manufacture flows, representative mask flows can be built. These flows are then used to calculate mask costs for advanced lithography down to the 50 nm node. It is never the goal of this type of work to provide absolute cost estimates for business planning purposes. However, the combination of a quantifiable yield model with a clearly defined set of mask processing flows and a cost model based upon them serves as an excellent starting point for cost driver analysis and process flow discussion.

  1. Forward masking in distinguishing inner and outer hair cell damage

    Institute of Scientific and Technical Information of China (English)

    DUAN Mao-li

    2009-01-01

    @@ Forward Masking Temporal audiotory resolution is the ability of the auditory system to resolve auditory signals in the time domain. Forward masking is a means of studying tem-poral resolution where one tone, the probe, is masked by a preceding tone, the masker. Forward masking is believed to relate to the adaptation of the aucliotory system[1-4].

  2. Neonatal resuscitation 3: manometer use in a model of face mask ventilation

    Science.gov (United States)

    O'Donnell, C; Davis, P; Lau, R; Dargaville, P; Doyle, L; Morley, C

    2005-01-01

    Background: Adequate ventilation is the key to successful neonatal resuscitation. Positive pressure ventilation (PPV) is initiated with manual ventilation devices via face masks. These devices may be used with a manometer to measure airway pressures delivered. The expiratory tidal volume measured at the mask (VTE(mask)) is a good estimate of the tidal volume delivered during simulated neonatal resuscitation. Aim: To assess the effect of viewing a manometer on the peak inspiratory pressures used, the volume delivered, and leakage from the face mask during PPV with two manual ventilation devices in a model of neonatal resuscitation. Methods: Participants gave PPV to a modified resuscitation mannequin using a Laerdal infant resuscitator and a Neopuff infant resuscitator at specified pressures ensuring adequate chest wall excursion. Each participant gave PPV to the mannequin with each device twice, viewing the manometer on one occasion and unable to see the manometer on the other. Data from participants were averaged for each device used with the manometer and without the manometer separately. Results: A total of 7767 inflations delivered by the 18 participants were recorded and analysed. Peak inspiratory pressures delivered were lower with the Laerdal device. There were no differences in leakage from the face mask or volumes delivered. Whether or not the manometer was visible made no difference to any measured variable. Conclusions: Viewing a manometer during PPV in this model of neonatal resuscitation does not affect the airway pressure or tidal volumes delivered or the degree of leakage from the face mask. PMID:15871988

  3. Comparison of Masking Level Difference in Patients with Multiple Sclerosis and Healthy Control Group

    Directory of Open Access Journals (Sweden)

    Soghrat Faghihzadeh

    2012-03-01

    Full Text Available Background and Aim: Multiple sclerosis (MS is a neurological disorder that involves central nervous system. Studies have showed that multiple sclerosis affects behavioral central auditory tests, such as masking release or masking level difference (MLD. The purpose of this study is to compare the masking level difference between multiple sclerosis patients and normal subjects.Methods: This cross sectional and non-interventional study was conducted on 32 multiple sclerosis patients aged between 20-50 years and 32 controls matched for age and gender in Faculty of Rehabilitation, Tehran University of Medical Sciences. masking level difference test was performed on each subject.Results: The mean masking level difference in the two groups was significantly different (p<0.01 however, gender did not prove to play a role in this difference.Conclusion: As part of the multiple sclerosis diagnosis panel, masking level difference test is an efficient modality for evaluation of hearing impairment and monitoring of rehabilitation progress.

  4. Formulation design and optimization of taste-masked mouth-dissolving tablets of Tramadol hydrochloride

    Directory of Open Access Journals (Sweden)

    Patel K

    2010-01-01

    Full Text Available The aim of the present study was to mask the extremely bitter taste of Tramadol HCL, an opioid analgesic, and to formulate a tablet which can rapidly disintegrate in saliva (rapidly disintegrating tablet. The crucial aspect in the formulation of mouth-dissolving tablets is to mask the bitter taste and to minimize the disintegration time. Taste masking was done using sweetening agent and D-mannitol and taste-masked pellets were prepared by extrusion spheronization technique. Prepared pellets were tested for drug content, taste evaluation in oral cavity and molecular property. Pellet shows significant taste masking, confirmed by in vitro taste evaluation; therefore, it was selected for further study. Pellets were evaluated for density, angle of repose, Carr′s index, Hausner′s ratio and sphericity while tablets were evaluated for disintegration and in vitro dissolution. A 3 2 full factorial design and statistical models were applied to optimize the effect of two factors, i.e. superdisintegrant sodium starch glycolate and taste-masking agent (D-mannitol. In this study, response surface methodology was used for designing of the experiment, generation of mathematical models and optimization study. Taste evaluation of pellets in human volunteers revealed considerable taste masking with a degree of bitterness below threshold value (2.0 within 10 s, whereas Tramadol HCl was rated intensely bitter with a score of +4 for 10 s. The size of the pellets varied from 0.895 to 1.423 mm for different batch and found to be a spherical. Disintegration time of different formulations varied from 30 to 60 s. It was observed that the responses, i.e. disintegration time and sphericity were affected by both the factors. The statistical models were validated and can be successfully used to prepare optimized taste-masked mouth-dissolving tablets of Tramadol HCl with adequate disintegration and shape.

  5. Impact of mask line edge roughness and statistical noise on next generation mask making

    Science.gov (United States)

    Kim, Byung Gook; Choi, Jin; Lee, Sang Hee; Jeon, Chan Uk

    2012-06-01

    As extreme ultraviolet lithography (EUVL) moves toward high volume manufacturing and pushes to increasingly smaller critical dimensions, achieving the stringent requirements for line edge roughness (LER) is increasingly challenging. For the 22 nm half-pitch node and beyond, the International Roadmap for Semiconductors requires less than 1.6 nm of line width roughness (LWR) on the wafer. The major contributor of this tight LWR is wafer resist LER and mask LER. However, in current ITRS, there is no guideline for mask LER. While significant progress has been made to reduce the resist of the LER on the wafer, it is not yet clear how much the mask LER should be improved for a 22 nm half-pitch node application. Additionally, there are various approaches to obtaining a smaller LER on the mask. It could be improved either by reducing well-known statistical noise or manipulating some process condition or material. Both approaches are effective in improving the LER, however, they shows a different result in mask CD uniformity itself. In this paper, in addition to setting the criteria of the mask LER, we will discuss how tight the mask LER is required to be and what kind of approach is desirable with regards to the LER and CD uniformity. Finally, an analysis of the LER and CD variation provides some insights into the impact of the next generation mask infrastructure.

  6. Metrology on phase-shift masks

    Science.gov (United States)

    Roeth, Klaus-Dieter; Maurer, Wilhelm; Blaesing-Bangert, Carola

    1992-06-01

    In the evaluation of new manufacturing processes, metrology is a key function, beginning with the first step of process development through the final step of everyday mass production at the fabrication floor level. RIM-type phase shift masks are expected to be the first application of phase shift masks in high volume production, since they provide improved lithography process capability at the expense of only moderate complexity in their manufacturing. Measurements of critical dimension (CD) and pattern position (overlay) on experimental rim-type and chromeless phase shift masks are reported. Pattern placement (registration) was measured using the Leitz LMS 2000. The overall design and important components were already described. The pattern placement of the RIM type phase shift structures on the photomask described above was determined within a tolerance of 25 nm (3s); nominal accuracy was within 45 nm (3s). On the chromeless phase shift mask the measurement results were easily obtained using a wafer intensity algorithm available with the system. The measurement uncertainties were less than 25 nm and 50 nm for precision and nominal accuracy respectively. The measurement results from the Leitz CD 200 using transmitted light were: a CD- distribution of 135 nm (3s) on a typical 6 micrometers structure all over the mask; the 0.9 micrometers RIM structure had a distribution of 43 nm (3s). Typical long term precision performance values for the CD 200 on both chrome and phase shift structures have been less than 15 nm.

  7. Radiopaque Tagging Masks Caries Lesions following Incomplete Excavation in vitro.

    Science.gov (United States)

    Schwendicke, F; Meyer-Lueckel, H; Schulz, M; Dörfer, C E; Paris, S

    2014-06-01

    One-step incomplete excavation seals caries-affected dentin under a restoration and appears to be advantageous in the treatment of deep lesions. However, it is impossible to discriminate radiographically between intentionally left, arrested lesions and overlooked or active lesions. This diagnostic uncertainty decreases the acceptance of minimally invasive excavation and might lead to unnecessary re-treatment of incompletely excavated teeth. Radiopaque tagging of sealed lesions might mask arrested lesions and assist in discrimination from progressing lesions. Therefore, we microradiographically screened 4 substances (SnCl2, AgNO3, CsF, CsCH3COO) for their effect on artificial lesions. Since water-dissolved tin chloride (SnCl2×Aq) was found to stably mask artificial lesions, we then investigated its radiographic effects on progressing lesions. Natural lesions were incompletely excavated and radiopaque tagging performed. Grey-value differences (△GV) between sound and carious dentin were determined and radiographs assessed by 20 dentists. While radiographic effects of SnCl2×Aq were stable for non-progressing lesions, they significantly decreased during a second demineralization (p < .001, t test). For natural lesions, tagging with SnCl2×Aq significantly reduced △GV (p < .001, Wilcoxon). Tagged lesions were detected significantly less often than untagged lesions (p < .001). SnCl2×Aq was suitable to mask caries-affected dentin and discriminate between arrested and progressing lesions in vitro. Radiopaque tagging could resolve diagnostic uncertainties associated with incomplete excavation. PMID:24718110

  8. Coherent Diffractive Imaging Using Randomly Coded Masks

    CERN Document Server

    Seaberg, Matthew H; Turner, Joshua J

    2015-01-01

    Coherent diffractive imaging (CDI) provides new opportunities for high resolution X-ray imaging with simultaneous amplitude and phase contrast. Extensions to CDI broaden the scope of the technique for use in a wide variety of experimental geometries and physical systems. Here, we experimentally demonstrate a new extension to CDI that encodes additional information through the use of a series of randomly coded masks. The information gained from the few additional diffraction measurements removes the need for typical object-domain constraints; the algorithm uses prior information about the masks instead. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments. Diffraction patterns are collected with up to 15 different masks placed between a CCD detector and a single sample. Phase retrieval is performed using a convex relaxation routine known as "PhaseCut" followed by a variation on Fienup's input-output algorit...

  9. Informational masking release in children and adults

    OpenAIRE

    Hall, Joseph W.; Buss, Emily; Grose, John H.

    2005-01-01

    This study assessed informational masking and utilization of cues to reduce that masking in children aged 4–9 years and in adults. The signal was a train of eight consecutive tone bursts, each at 1 kHz and 60 ms in duration. Maskers were comprised of a pair of synchronous tone-burst trains, with randomly chosen frequencies spanning 200–5000 Hz, with a protected region 851–1175 Hz. In the reference condition, maskers were eight bursts in duration, with a fixed frequency within intervals. Exper...

  10. Carbon contamination topography analysis of EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  11. The 8q22.1 microdeletion syndrome or Nablus mask-like facial syndrome : Report on two patients and review of the literature

    NARCIS (Netherlands)

    Raas-Rothschild, Annick; Dijkhuizen, Trijnie; Sikkema-Raddatz, Birgit; Werner, Marion; Dagan, Judith; Abeliovich, Devorah; Lerer, Israela

    2009-01-01

    Nablus mask-like facial syndrome (NMFLS) is a rare microdeletion syndrome with a mask-like facial appearance as the most characteristic feature. In 2000, Teebi, was the first to report on a 4 years old boy affected with NMFLS. Since then two additional patients have been reported. Three years later,

  12. Cosmic Ballet or Devil's Mask?

    Science.gov (United States)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  13. Outcome measures based on classification performance fail to predict the intelligibility of binary-masked speech

    DEFF Research Database (Denmark)

    Kressner, Abigail Anne; May, Tobias; Rozell, Christopher J.

    2016-01-01

    To date, the most commonly used outcome measure for assessing ideal binary mask estimation algorithms is based on the difference between the hit rate and the false alarm rate (H-FA). Recently, the error distribution has been shown to substantially affect intelligibility. However, H-FA treats each...

  14. Adaptation to different noninvasive ventilation masks in critically ill patients

    Directory of Open Access Journals (Sweden)

    Renata Matos da Silva

    2013-06-01

    Full Text Available OBJECTIVE: To identify which noninvasive ventilation (NIV masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%. Total face masks were the most commonly used (in 74.7%, followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively. Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

  15. A new approach for defect inspection on large area masks

    Science.gov (United States)

    Scheuring, Gerd; Döbereiner, Stefan; Hillmann, Frank; Falk, Günther; Brück, Hans-Jürgen

    2007-02-01

    Besides the mask market for IC manufacturing, which mainly uses 6 inch sized masks, the market for the so called large area masks is growing very rapidly. Typical applications of these masks are mainly wafer bumping for current packaging processes, color filters on TFTs, and Flip Chip manufacturing. To expose e.g. bumps and similar features on 200 mm wafers under proximity exposure conditions 9 inch masks are used, while in 300 mm wafer bumping processes (Fig. 1) 14 inch masks are handled. Flip Chip manufacturing needs masks up to 28 by 32 inch. This current maximum mask dimension is expected to hold for the next 5 years in industrial production. On the other hand shrinking feature sizes, just as in case of the IC masks, demand enhanced sensitivity of the inspection tools. A defect inspection tool for those masks is valuable for both the mask maker, who has to deliver a defect free mask to his customer, and for the mask user to supervise the mask behavior conditions during its lifetime. This is necessary because large area masks are mainly used for proximity exposures. During this process itself the mask is vulnerable by contacting the resist on top of the wafers. Therefore a regular inspection of the mask after 25, 50, or 100 exposures has to be done during its whole lifetime. Thus critical resist contamination and other defects, which lead to yield losses, can be recognized early. In the future shrinking feature dimensions will require even more sensitive and reliable defect inspection methods than they do presently. Besides the sole inspection capability the tools should also provide highly precise measurement capabilities and extended review options.

  16. Posleslovije k "Zolotoi maske" / Boris Tuch

    Index Scriptorium Estoniae

    Tuch, Boris, 1946-

    2005-01-01

    Vene draamafestivali "Kuldne mask Eestis" lavastusest : "September.doc", lav. Mihhail Ugarov, I. Võrõpajevi "Hapnik" lav. Viktor Rõzhakov Teatr.doc esituses, Sophoklese "Kuningas Oidipus" lav. Andrei Prikotenko Peterburi Teatri Liteinõi esituses, M. Ugarovi lavastus "OblomOFF"

  17. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  18. Central auditory masking by an illusory tone.

    Directory of Open Access Journals (Sweden)

    Christopher J Plack

    Full Text Available Many natural sounds fluctuate over time. The detectability of sounds in a sequence can be reduced by prior stimulation in a process known as forward masking. Forward masking is thought to reflect neural adaptation or neural persistence in the auditory nervous system, but it has been unclear where in the auditory pathway this processing occurs. To address this issue, the present study used a "Huggins pitch" stimulus, the perceptual effects of which depend on central auditory processing. Huggins pitch is an illusory tonal sensation produced when the same noise is presented to the two ears except for a narrow frequency band that is different (decorrelated between the ears. The pitch sensation depends on the combination of the inputs to the two ears, a process that first occurs at the level of the superior olivary complex in the brainstem. Here it is shown that a Huggins pitch stimulus produces more forward masking in the frequency region of the decorrelation than a noise stimulus identical to the Huggins-pitch stimulus except with perfect correlation between the ears. This stimulus has a peripheral neural representation that is identical to that of the Huggins-pitch stimulus. The results show that processing in, or central to, the superior olivary complex can contribute to forward masking in human listeners.

  19. Differential effects of forward and backward masks on the relationship between perception and action.

    Science.gov (United States)

    Deplancke, A; Madelain, L; Coello, Y

    2016-03-01

    A recent series of experiments has shown that the effects of near-threshold stimuli on perceptual and motor responses are highly dependent on experimental conditions. In particular, motor influences of near-threshold distractors were observed when using low-contrast unmasked stimuli and high-contrast masked stimuli although only the latter affected motor responses in the absence of stimulus awareness. These results are compatible with neurophysiological models of visual masking, suggesting that early neural responses to a visual stimulus can be decomposed in feedforward activations to-and feedback activations from-higher visual areas, correlating respectively with the actual presence of the stimulus and its conscious perception. We tested the compatibility between these neurophysiological models and the behavioural data obtained in near-threshold experiments. We recorded fast reaching movements directed to a highly visible target followed by a report of the presence of a near-threshold distractor presented either at low contrast without mask or at high contrast with a backward or forward mask. Analysis of hand trajectories revealed that deviations toward the distractor were observed in the no-mask condition when the distractor was present and reported, and when it was present but not reported in the backward and forward mask conditions, although the effect was weaker in the latter condition. These data reveal that the presence or absence of perception-action dissociations in behavioural studies are well accounted for by neurophysiological models of visual masking and that behavioural effects of near-threshold distractors cannot result merely from on a dichotomic visual system for perception and action.

  20. Silicon germanium as a novel mask for silicon deep reactive ion etching

    KAUST Repository

    Serry, Mohamed Y.

    2013-10-01

    This paper reports on the use of p-type polycrystalline silicon germanium (poly-Si1-xGex) thin films as a new masking material for the cryogenic deep reactive ion etching (DRIE) of silicon. We investigated the etching behavior of various poly-Si1-xGex:B (0mask for silicon depends strongly on three factors: Ge content; boron concentration; and etching temperature. Compared to conventional SiO2 and SiN masks, the proposed SiGe masking material exhibited several advantages, including high etching selectivity to silicon (>1:800). Furthermore, the SiGe mask was etched in SF6/O2 plasma at temperatures ≥ - 80°C and at rates exceeding 8 μm/min (i.e., more than 37 times faster than SiO2 or SiN masks). Because of the chemical and thermodynamic stability of the SiGe film as well as the electronic properties of the mask, it was possible to deposit the proposed film at CMOS backend compatible temperatures. The paper also confirms that the mask can easily be dry-removed after the process with high etching-rate by controlling the ICP and RF power and the SF6 to O2 ratios, and without affecting the underlying silicon substrate. Using low ICP and RF power, elevated temperatures (i.e., > - 80°C), and an adjusted O2:SF6 ratio (i.e., ~6%), we were able to etch away the SiGe mask without adversely affecting the final profile. Ultimately, we were able to develop deep silicon- trenches with high aspect ratio etching straight profiles. © 1992-2012 IEEE.

  1. Sculpture of decorative candlestick based on African totem masks

    Directory of Open Access Journals (Sweden)

    Sofronova Nadezhda

    2015-04-01

    Full Text Available The paper deals with the decorative small sculptures and African totem masks, their artistic and stylistic fea-tures, analysis of the works of sculptors and steps for creating a decorative candlestick based on African totem masks.

  2. Wavelength-specific reflections: A decade of EUV actinic mask inspection research

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth; Mochi, Iacopo

    2010-12-31

    Mask inspection is essential for the success of any pattern-transfer lithography technology, and EUV Lithography in particular faces unique challenges. EUV masks resonant-reflective multilayer coatings have a narrow, wavelength-specific response that dramatically affects the way that defects appear, or disappear, at various illuminating wavelengths. Furthermore, the ever-shrinking size of 'critical' defects limits the potential effectiveness of DUV inspection techniques over time. Researchers pursuing numerous ways of finding and characterizing defects on EUV masks and have met with varying degrees of success. Their lessons inform the current, urgent exploration to select the most effective techniques for high-volume manufacturing. Ranging from basic research and demonstration experiments to commercial inspection tool prototypes, we survey the recent history of work in this area, including sixteen projects in Europe, Asia, and America. Solutions range from scanning beams to microscopy, dark field imaging to pattern transfer.

  3. Effects of the combination of mask preconditioning with midazolam pretreatment on anxiety and mask acceptance during pediatric inhalational induction and postoperative mask fear in children

    Institute of Scientific and Technical Information of China (English)

    LAN Yun-ping; HUANG Zhen-hua; G.Allen Finley; ZUO Yun-xia

    2012-01-01

    Background Anxiety and fear frequently causes an aversion to applying a face mask and increases difficulty during pediatric induction.There is at present little study of this problem.Therefore,the aim of this study was to investigate the effect of the combination of mask preconditioning and midazolam pretrealment on mask acceptance during pediatric induction and on postoperative mask fear.Methods One hundred and sixty children were randomly assigned into four groups:the mask preconditioning group (MaG),the midazolam pretreatment group (MiG),the mask/midazolam combination group (Ma/MiG),and the saline group (SaG).The Modified Yale Preoperative Anxiety Scale (m-YPAS) was employed to assess the anxiety in the operation room (OR).A Mask Acceptance Score (MAS) was measured during inhalational induction and the incidence of mask fear (MAS ≤2) was evaluated postoperatively.Results The MaG and Ma/MiG groups had the highest mask acceptance scores but there were no differences between these two groups (P <0.05).The average anxiety level of children entering the OR was much lower in the MaG and Ma/MiG groups than in the SaG group (P <0.05).During induction,the anxiety level increased in the SaG and MaG groups but decreased in the MiG and Ma/MiG groups (P <0.05).At the postoperative third day,the incidence of mask fears was as high as 23% in the SaG group,15% in the MiG group,but only 2.5% in the MaG and Ma/MiG groups.Conclusions The single use of mask preconditioning has a better influence than midazolam for increasing mask acceptance during inhalational induction and reducing postoperative mask fear,reducing the anxiety level during induction,improving induction compliance and shortening the total mask time.A mask preconditioning and midazolam combination did not increase mask acceptance during inhalational induction,reduce mask fears postoperatively,improve induction compliance,nor shorten the total mask time.But it can better reduce the anxiety level during

  4. How color, regularity, and good Gestalt determine backward masking.

    Science.gov (United States)

    Sayim, Bilge; Manassi, Mauro; Herzog, Michael

    2014-06-18

    The strength of visual backward masking depends on the stimulus onset asynchrony (SOA) between target and mask. Recently, it was shown that the conjoint spatial layout of target and mask is as crucial as SOA. Particularly, masking strength depends on whether target and mask group with each other. The same is true in crowding where the global spatial layout of the flankers and target-flanker grouping determine crowding strength. Here, we presented a vernier target followed by different flanker configurations at varying SOAs. Similar to crowding, masking of a red vernier target was strongly reduced for arrays of 10 green compared with 10 red flanking lines. Unlike crowding, single green lines flanking the red vernier showed strong masking. Irregularly arranged flanking lines yielded stronger masking than did regularly arranged lines, again similar to crowding. While cuboid flankers reduced crowding compared with single lines, this was not the case in masking. We propose that, first, masking is reduced when the flankers are part of a larger spatial structure. Second, spatial factors counteract color differences between the target and the flankers. Third, complex Gestalts, such as cuboids, seem to need longer processing times to show ungrouping effects as observed in crowding. Strong parallels between masking and crowding suggest similar underlying mechanism; however, temporal factors in masking additionally modulate performance, acting as an additional grouping cue.

  5. The difficult business model for mask equipment makers and mask infrastructure development support from consortia and governments

    Science.gov (United States)

    Hector, Scott

    2005-11-01

    The extension of optical projection lithography through immersion to patterning features with half pitch business model for mask equipment suppliers and highlight government support for mask equipment and materials development.

  6. Development and evaluation of new mask protocols for gene expression profiling in humans and chimpanzees

    Directory of Open Access Journals (Sweden)

    Siegmund Kimberly D

    2009-03-01

    Full Text Available Abstract Background Cross-species gene expression analyses using oligonucleotide microarrays designed to evaluate a single species can provide spurious results due to mismatches between the interrogated transcriptome and arrayed probes. Based on the most recent human and chimpanzee genome assemblies, we developed updated and accessible probe masking methods that allow human Affymetrix oligonucleotide microarrays to be used for robust genome-wide expression analyses in both species. In this process, only data from oligonucleotide probes predicted to have robust hybridization sensitivity and specificity for both transcriptomes are retained for analysis. Results To characterize the utility of this resource, we applied our mask protocols to existing expression data from brains, livers, hearts, testes, and kidneys derived from both species and determined the effects probe numbers have on expression scores of specific transcripts. In all five tissues, probe sets with decreasing numbers of probes showed non-linear trends towards increased variation in expression scores. The relationships between expression variation and probe number in brain data closely matched those observed in simulated expression data sets subjected to random probe masking. However, there is evidence that additional factors affect the observed relationships between gene expression scores and probe number in tissues such as liver and kidney. In parallel, we observed that decreasing the number of probes within probe sets lead to linear increases in both gained and lost inferences of differential cross-species expression in all five tissues, which will affect the interpretation of expression data subject to masking. Conclusion We introduce a readily implemented and updated resource for human and chimpanzee transcriptome analysis through a commonly used microarray platform. Based on empirical observations derived from the analysis of five distinct data sets, we provide novel guidelines

  7. Effect of harmonicity on the detection of a signal in a complex masker and on spatial release from masking.

    Directory of Open Access Journals (Sweden)

    Astrid Klinge

    Full Text Available The amount of masking of sounds from one source (signals by sounds from a competing source (maskers heavily depends on the sound characteristics of the masker and the signal and on their relative spatial location. Numerous studies investigated the ability to detect a signal in a speech or a noise masker or the effect of spatial separation of signal and masker on the amount of masking, but there is a lack of studies investigating the combined effects of many cues on the masking as is typical for natural listening situations. The current study using free-field listening systematically evaluates the combined effects of harmonicity and inharmonicity cues in multi-tone maskers and cues resulting from spatial separation of target signal and masker on the detection of a pure tone in a multi-tone or a noise masker. A linear binaural processing model was implemented to predict the masked thresholds in order to estimate whether the observed thresholds can be accounted for by energetic masking in the auditory periphery or whether other effects are involved. Thresholds were determined for combinations of two target frequencies (1 and 8 kHz, two spatial configurations (masker and target either co-located or spatially separated by 90 degrees azimuth, and five different masker types (four complex multi-tone stimuli, one noise masker. A spatial separation of target and masker resulted in a release from masking for all masker types. The amount of masking significantly depended on the masker type and frequency range. The various harmonic and inharmonic relations between target and masker or between components of the masker resulted in a complex pattern of increased or decreased masked thresholds in comparison to the predicted energetic masking. The results indicate that harmonicity cues affect the detectability of a tonal target in a complex masker.

  8. The VLT-VIMOS Mask Preparation Software

    CERN Document Server

    Bottini, D; MacCagni, D; Tresse, L; Le Brun, V; Lefèvre, O; Picat, J P; Scaramella, R; Scodeggio, M; Vettolani, G; Zanichelli, A; Adami, C; Arnaboldi, M; Arnouts, S; Bardelli, S; Bolzonella, M; Cappi, A; Charlot, S; Contini, T; Foucaud, S; Franzetti, P; Guzzo, L; Ilbert, O; Iovino, A; McCracken, H J; Marano, B; Marinoni, C; Mathez, G; Mazure, A; Meneux, B; Merighi, R; Paltani, S; Pollo, A; Pozzetti, L; Radovich, M; Zamorani, G; Zucca, E

    2004-01-01

    VIMOS (VIsible Multi-Object Spectrograph) is a multi-object imaging spectrograph installed at the VLT (Very large Telescope) at the ESO (European Southern Observatory) Paranal Observatory, especially suited for survey work. VIMOS is characterized by its very high multiplexing factor: it is possible to take up to 800 spectra with 10 arcsec long slits in a single exposure. To fully exploit its multiplexing potential, we designed and implemented a dedicated software tool: the VIMOS Mask Preparation Software (VMMPS), which allows the astronomer to select the objects to be spectroscopically observed, and provides for automatic slit positioning and slit number maximization within the instrumental constraints. The output of VMMPS is used to manufacture the slit masks to be mounted in the instrument for spectroscopic observations.

  9. Masking mediated print defect visibility predictor

    Science.gov (United States)

    Jing, Xiaochen; Nachlieli, Hila; Shaked, Doron; Shiffman, Smadar; Allebach, Jan P.

    2012-01-01

    Banding is a well-known artifact produced by printing systems. It usually appears as lines perpendicular to the process direction of the print. Therefore, banding is an important print quality issue which has been analyzed and assessed by many researchers. However, little literature has focused on the study of the masking effect of content for this kind of print quality issue. Compared with other image and print quality research, our work is focused on the print quality of typical documents printed on a digital commercial printing press. In this paper, we propose a Masking Mediated Print Defect Visibility Predictor (MMPDVP) to predict the visibility of defects in the presence of customer content. The parameters of the algorithm are trained from ground-truth images that have been marked by subjects. The MMPDVP could help the press operator decide whether the print quality is acceptable for specific customer requirements. Ultimately, this model can be used to optimize the print-shop workflow.

  10. Contrast Gain Control Model Fits Masking Data

    Science.gov (United States)

    Watson, Andrew B.; Solomon, Joshua A.; Null, Cynthia H. (Technical Monitor)

    1994-01-01

    We studied the fit of a contrast gain control model to data of Foley (JOSA 1994), consisting of thresholds for a Gabor patch masked by gratings of various orientations, or by compounds of two orientations. Our general model includes models of Foley and Teo & Heeger (IEEE 1994). Our specific model used a bank of Gabor filters with octave bandwidths at 8 orientations. Excitatory and inhibitory nonlinearities were power functions with exponents of 2.4 and 2. Inhibitory pooling was broad in orientation, but narrow in spatial frequency and space. Minkowski pooling used an exponent of 4. All of the data for observer KMF were well fit by the model. We have developed a contrast gain control model that fits masking data. Unlike Foley's, our model accepts images as inputs. Unlike Teo & Heeger's, our model did not require multiple channels for different dynamic ranges.

  11. Multi-part mask for implanting workpieces

    Energy Technology Data Exchange (ETDEWEB)

    Webb, Aaron P.; Carlson, Charles T.

    2016-05-10

    A multi-part mask has a pattern plate, which includes a planar portion that has the desired aperture pattern to be used during workpiece processing. The multi-part mask also has a mounting frame, which is used to hold the pattern plate. Prior to assembly, the pattern plate has an aligning portion, which has one or more holes through which reusable alignment pins are inserted. These alignment pins enter kinematic joints disposed on the mounting frame, which serve to precisely align the pattern plate to the mounting frame. After the pattern plate has been secured to the mounting frame, the aligning portion can be detached from the pattern plate. The alignment pins can be reused at a later time. In some embodiments, the pattern plate can later be removed from the mounting frame, so that the mounting frame may be reused.

  12. Finding Terrestrial Planets Using Eighth-Order Image Masks

    CERN Document Server

    Kuchner, M J; Ge, J; Kuchner, Marc J.; Crepp, Justin; Ge, Jian

    2004-01-01

    We offer a new series of image masks for coronagraphy that are insensitive to pointing errors and other low-spatial frequency optical aberrations. For a modest cost in throughput, these ``eighth-order'' band-limited masks would allow the Terrestrial Planet Finder (TPF) to operate with a pointing accuracy of no better than that of the Hubble Space Telescope. We also provide eighth-order notch filter masks that offer the same robustness to pointing errors and should be relatively easy to construct: binary masks and graded masks with moderate optical density requirements.

  13. Partitioning mechanisms of masking: contrast transducer versus divisive inhibition

    Science.gov (United States)

    Barghout-Stein, Lauren; Tyler, Christopher W.; Klein, Stanley A.

    1997-06-01

    The properties of spatial vision mechanisms are often explored psychophysically with simultaneous masking paradigms. A variety of hypotheses have been proposed to explain how the mask pattern utilized in these paradigms increases threshold. Numerous studies have investigated the properties of a particular origin of masking hypothesis but few have attempted to compare the properties of masking at several points in the process. Our study isolates masking due to lateral divisive inhibition at a point where mechanism responses are combined, and compares it with masking of the same target due to a nonlinearity either intrinsic to a mechanism or directly operating on the response of a single mechanism. We also measure the slopes of psychometric functions to examine the relationship between uncertainty and mask contrast. Studies of simultaneous masking utilizing a pedestal mask (an identical test and mask pattern) have measured facilitation for low contrast masks. This decrease in threshold from the solo target threshold is commonly referred to as the 'dipper' effect and has been explained as an increase in signal-to- noise ratio from the high unmasked level occurring as the visual system becomes more certain of target location. The level of uncertainty is indicated by the slope of sensitivity to the target as a function of target contrast in the threshold region. In these studies, high contrast masks have evoked an increase in target threshold. There have been many theories explaining this threshold increase. Some suggest that masking is the result of an intrinsic nonlinearity within a mechanism or of a contrast nonlinearity that operates directly on the output of a single mechanism. Others put the source of masking at a gain control operation which occurs when a surrounding set of mechanisms divide the response of a single mechanism by their summed response. Still others attribute the masking to noise that is multiplicative relative to the neural response signal, or

  14. ILT Approach for Compensating 3-D Mask Effects

    Institute of Scientific and Technical Information of China (English)

    XIONG Wei; ZHANG Jinyu; MinChun; WANG Yan; YU Zhiping

    2009-01-01

    As mask features scale to smaller dimensions,the so-called "3-D mask effects" which have mostly been neglected before,become important.This paper properly models the 3-D thick mask effects,and then analyses the object-based inverse lithography technique using a simulated annealing algorithm to determine the mask shapes that produce the desired on-wafer results.Evaluations against rigorous simulations show that the synthesized masks provide good image fidelity up to 0.94,and this approach gives improved accuracy and faster results than existing methods.

  15. MADE: Masked Autoencoder for Distribution Estimation

    OpenAIRE

    Germain, Mathieu; Gregor, Karol; Murray, Iain; Larochelle, Hugo

    2015-01-01

    There has been a lot of recent interest in designing neural network models to estimate a distribution from a set of examples. We introduce a simple modification for autoencoder neural networks that yields powerful generative models. Our method masks the autoencoder’s parameters to respect autoregressive constraints: each input is reconstructed only from previous inputs in a given ordering. Constrained this way, the autoencoder outputs can be interpreted as a set of conditional probabilities, ...

  16. MADE: Masked Autoencoder for Distribution Estimation

    OpenAIRE

    Germain, Mathieu; Gregor, Karol; Murray, Iain; Larochelle, Hugo

    2015-01-01

    There has been a lot of recent interest in designing neural network models to estimate a distribution from a set of examples. We introduce a simple modification for autoencoder neural networks that yields powerful generative models. Our method masks the autoencoder's parameters to respect autoregressive constraints: each input is reconstructed only from previous inputs in a given ordering. Constrained this way, the autoencoder outputs can be interpreted as a set of conditional probabilities, ...

  17. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  18. Cor, iluminação e orientação do reverso de uma máscara facial não afetam a ilusão da máscara côncava Color, illumination and orientation of a hollow mask do not affect the hollow-face illusion

    Directory of Open Access Journals (Sweden)

    Maria Amélia Cesari Quaglia

    2009-08-01

    Full Text Available Em condição monocular, 40 observadores julgaram o reverso côncavo de uma máscara facial monocromada cinza e de outra policromada (iluminados por cima, por baixo, pela direita e pela esquerda na posição vertical e na posição vertical invertida, iluminado por baixo como côncavos, planos ou convexos. Além disso, as magnitudes dos seus relevos percebidos foram reproduzidas ao se esticar uma trena retrátil. Independente da cor, iluminação e orientação das máscaras, a maioria das respostas indicou que os reversos das máscaras foram percebidos como convexos. E mesmo nas poucas respostas em que as máscaras foram classificadas como planas, houve atribuição de relevo mensurável. Estes resultados confirmam que a ilusória profundidade da máscara facial côncava como convexa é robusta sob influência de variáveis diversas, o que sugere atuação predominante de processos de alta ordem sobre os processos de baixa ordem na percepção visual de faces.With monocular viewing, forty observers judged a monochrome-gray and a polychrome hollow face mask (illuminated from above, from below, from the right and from the left, and upside-down illuminated form below as inward deep, flat or outward deep. They were also asked to reproduce the perceived depth of the mask by pulling out a tape measure. Regardless of color, illuminating condition and mask orientation, most of the responses indicated that the hollow faces were perceived as outward deep. Even in the few occasions in which the masks were reported flat, measurable depths were assigned on the tape measure. These results support that the hollow face illusion is robust even under diverse variable effects, which suggest preponderant top-down over bottom-up processes on visual face perception.

  19. Nanoparticle and nanosphere mask for etching of ITO nanostructures and their reflection properties

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Cigang; Deng, Ligang; Holder, Adam; Bailey, Louise R.; Proudfoot, Gary; Thomas, Owain; Gunn, Robert; Cooke, Mike [Oxford Instruments Plasma Technology, Bristol (United Kingdom); Leendertz, Caspar [Helmholtz-Zentrum Berlin fuer Materialien und Energie, Institut fuer Silizium Photovoltaik, Berlin (Germany); Bergmann, Joachim [Leibniz Institute of Photonic Technology, Jena (Germany)

    2015-01-01

    Au nanoparticles and polystyrene nanospheres were used as mask for plasma etching of indium tin oxide (ITO) layer. By reactive ion etching (RIE) processes, the morphology of polystyrene nanospheres can be tuned through chemical or physical etching, and Au nanoparticle mask can result in ITO nanostructures with larger aspect ratio than nanosphere mask. During inductively coupled plasma (ICP) processes, Au nanoparticle mask was not affected by the thermal effect of plasma, whereas temperature of the substrate was essential to protect nanospheres from the damaging effect of plasma. Physical bombardment in the plasma can also modify the nanospheres. It was observed that under the same process conditions, the ratio of CH{sub 4} and H{sub 2} in the process gas can affect the etching rate of ITO without completely etching the nanospheres. The morphology of ITO nanostructures also depends on process conditions. The resulting ITO nanostructures show lower reflection in a spectral range of 400-1000 nm than c-Si and conventional antireflection layer of SiN{sub x} film. ITO nanostructures obtained after etching (scale bar = 200 nm). (copyright 2015 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  20. The effect of cochlear nonlinearities on binaural masking level differences

    DEFF Research Database (Denmark)

    Le Goff, Nicolas; Kohlrausch, Armin

    Background The binaural masking level difference (BMLD) has been shown to be constant (10−15dB) for masker spectrum levels from 70dB/Hz down to 30−40dB/Hz and to gradually decrease with lower levels (McFadden, 1968; Hall and Harvey, 1984). The decrease at low levels was larger in an asymmetric...... that the difference in BMLD between the symmetric and the two asymmetric conditions is constant, in line with the experimental data. Conclusion A model was proposed to account for the effect of level asymmetry on BMLD. The modeling results suggest that cochlear nonlinearites affect the analysis of binaural cues a  at...

  1. The masked priming toolbox: an open-source MATLAB toolbox for masked priming researchers.

    Science.gov (United States)

    Wilson, Andrew D; Tresilian, James; Schlaghecken, Friederike

    2011-03-01

    The Masked Priming Toolbox is an open-source collection of MATLAB functions that utilizes the free third-party PsychToolbox-3 (PTB3: Brainard, Spatial Vision, 10, 433-436, 1997; Kleiner, Brainard & Pelli, Perception, 36, 2007; Pelli, Spatial Vision, 10, 437-442, 1997). It is designed to allow a researcher to run masked (and unmasked) priming experiments using a variety of response devices (including keyboards, graphics tablets and force transducers). Very little knowledge of MATLAB is required; experiments are generated by creating a text file with the required parameters, and raw and analyzed data are output to Excel (as well as MATLAB) files for further analysis. The toolbox implements a variety of stimuli for use as primes and targets, as well as a variety of masks. Timing, size, location, and orientation of stimuli are all parameterizable. The code is open-source and made available on the Web under a Creative Commons License.

  2. Source mask optimization using 3D mask and compact resist models

    Science.gov (United States)

    El-Sewefy, Omar; Chen, Ao; Lafferty, Neal; Meiring, Jason; Chung, Angeline; Foong, Yee Mei; Adam, Kostas; Sturtevant, John

    2016-03-01

    Source Mask Optimization (SMO) has played an important role in technology setup and ground rule definition since the 2x nm technology node. While improvements in SMO algorithms have produced higher quality and more consistent results, the accuracy of the overall solution is critically linked to how faithfully the entire patterning system is modeled, from mask down to substrate. Fortunately, modeling technology has continued to advance to provide greater accuracy in modeling 3D mask effects, 3D resist behavior, and resist phenomena. Specifically, the Domain Decomposition Method (DDM) approximates the 3D mask response as a superposition of edge-responses.1 The DDM can be applied to a sectorized illumination source based on Hybrid-Hopkins Abbe approximation,2 which provides an accurate and fast solution for the modeling of 3D mask effects and has been widely used in OPC modeling. The implementation of DDM in the SMO flow, however, is more challenging because the shape and intensity of the source, unlike the case in OPC modeling, is evolving along the optimization path. As a result, it gets more complicated. It is accepted that inadequate pupil sectorization results in reduced accuracy in any application, however in SMO the required uniformity and density of pupil sampling is higher than typical OPC and modeling cases. In this paper, we describe a novel method to implement DDM in the SMO flow. The source sectorization is defined by following the universal pixel sizes used in SMO. Fast algorithms are developed to enable computation of edge signals from each fine pixel of the source. In this case, each pixel has accurate information to describe its contribution to imaging and the overall objective function. A more continuous angular spectrum from 3D mask scattering is thus captured, leading to accurate modeling of 3D mask effects throughout source optimization. This method is applied on a 2x nm middle-of-line layer test case. The impact of the 3D mask model accuracy on

  3. Strategy optimization for mask rule check in wafer fab

    Science.gov (United States)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  4. Mask defect printing mechanisms for future lithography generations

    Science.gov (United States)

    Erdmann, Andreas; Graf, Thomas; Bubke, Karsten; Höllein, Ingo; Teuber, Silvio

    2006-03-01

    Mask defects are of increasing concern for future lithography generations. The improved resolution capabilities of immersion and EUV systems increase also the sensitivity of these systems with respect to small imperfections of the mask. Advanced mask technologies such as alternating phase shift masks (AltPSM), chromeless phase shift lithography (CPL), or "thick" absorbers on EUV masks introduce new defect types. The paper presents an application of rigorous electromagnetic field modeling for the study of typical defect printing mechanisms in ArF immersion lithography and in EUV lithography. For standard imaging and mask technologies, such as binary masks or attenuated phase shift masks, small defects usually print as linewidth or critical dimension (CD) errors with the largest effect at best focus. For AltPSM, CPL masks, and EUV masks this is not always the case. Several unusual printing scenarios were observed: placement errors due to defects can become more critical than CD-errors, defects may print more critical at defocus positions different from the center of the process window, the defect printing may become asymmetric through focus, and the risk of defect printing depends on the polarization of the used light source. Several simulation examples will demonstrate these effects. Rigorous EMF simulations in combination with vector imaging simulations are very useful to understand the origins of the observed defect printing mechanisms.

  5. ILT based defect simulation of inspection images accurately predicts mask defect printability on wafer

    Science.gov (United States)

    Deep, Prakash; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter

    2016-05-01

    printability of defects at wafer level and automates the process of defect dispositioning from images captured using high resolution inspection machine. It first eliminates false defects due to registration, focus errors, image capture errors and random noise caused during inspection. For the remaining real defects, actual mask-like contours are generated using the Calibre® ILT solution [1][2], which is enhanced to predict the actual mask contours from high resolution defect images. It enables accurate prediction of defect contours, which is not possible from images captured using inspection machine because some information is already lost due to optical effects. Calibre's simulation engine is used to generate images at wafer level using scanner optical conditions and mask-like contours as input. The tool then analyses simulated images and predicts defect printability. It automatically calculates maximum CD variation and decides which defects are severe to affect patterns on wafer. In this paper, we assess the printability of defects for the mask of advanced technology nodes. In particular, we will compare the recovered mask contours with contours extracted from SEM image of the mask and compare simulation results with AIMSTM for a variety of defects and patterns. The results of printability assessment and the accuracy of comparison are presented in this paper. We also suggest how this method can be extended to predict printability of defects identified on EUV photomasks.

  6. Generic hierarchical engine for mask data preparation

    Science.gov (United States)

    Kalus, Christian K.; Roessl, Wolfgang; Schnitker, Uwe; Simecek, Michal

    2002-07-01

    Electronic layouts are usually flattened on their path from the hierarchical source downstream to the wafer. Mask data preparation has certainly been identified as a severe bottleneck since long. Data volumes are not only doubling every year along the ITRS roadmap. With the advent of optical proximity correction and phase-shifting masks data volumes are escalating up to non-manageable heights. Hierarchical treatment is one of the most powerful means to keep memory and CPU consumption in reasonable ranges. Only recently, however, has this technique acquired more public attention. Mask data preparation is the most critical area calling for a sound infrastructure to reduce the handling problem. Gaining more and more attention though, are other applications such as large area simulation and manufacturing rule checking (MRC). They all would profit from a generic engine capable to efficiently treat hierarchical data. In this paper we will present a generic engine for hierarchical treatment which solves the major problem, steady transitions along cell borders. Several alternatives exist how to walk through the hierarchy tree. They have, to date, not been thoroughly investigated. One is a bottom-up attempt to treat cells starting with the most elementary cells. The other one is a top-down approach which lends itself to creating a new hierarchy tree. In addition, since the variety, degree of hierarchy and quality of layouts extends over a wide range a generic engine has to take intelligent decisions when exploding the hierarchy tree. Several applications will be shown, in particular how far the limits can be pushed with the current hierarchical engine.

  7. Crowding is unlike ordinary masking: distinguishing feature integration from detection.

    Science.gov (United States)

    Pelli, Denis G; Palomares, Melanie; Majaj, Najib J

    2004-12-30

    A letter in the peripheral visual field is much harder to identify in the presence of nearby letters. This is "crowding." Both crowding and ordinary masking are special cases of "masking," which, in general, refers to any effect of a "mask" pattern on the discriminability of a signal. Here we characterize crowding, and propose a diagnostic test to distinguish it from ordinary masking. In ordinary masking, the signal disappears. In crowding, it remains visible, but is ambiguous, jumbled with its neighbors. Masks are usually effective only if they overlap the signal, but the crowding effect extends over a large region. The width of that region is proportional to signal eccentricity from the fovea and independent of signal size, mask size, mask contrast, signal and mask font, and number of masks. At 4 deg eccentricity, the threshold contrast for identification of a 0.32 deg signal letter is elevated (up to six-fold) by mask letters anywhere in a 2.3 deg region, 7 times wider than the signal. In ordinary masking, threshold contrast rises as a power function of mask contrast, with a shallow log-log slope of 0.5 to 1, whereas, in crowding, threshold is a sigmoidal function of mask contrast, with a steep log-log slope of 2 at close spacing. Most remarkably, although the threshold elevation decreases exponentially with spacing, the threshold and saturation contrasts of crowding are independent of spacing. Finally, ordinary masking is similar for detection and identification, but crowding occurs only for identification, not detection. More precisely, crowding occurs only in tasks that cannot be done based on a single detection by coarsely coded feature detectors. These results (and observers' introspections) suggest that ordinary masking blocks feature detection, so the signal disappears, while crowding (like "illusory conjunction") is excessive feature integration - detected features are integrated over an inappropriately large area because there are no smaller integration

  8. Marfan syndrome masked by Down syndrome?

    OpenAIRE

    Mulder, B. J.; van Engelen, K.; Vis, J.C.; Timmermans, J.; Hamel, B C J

    2009-01-01

    Down syndrome is the most common chromosomal abnormality. A simultaneous occurrence with Marfan syndrome is extremely rare. We present a case of a 28-year-old female with Down syndrome and a mutation in the fibrillin-1 gene. The patient showed strikingly few manifestations of Marfan syndrome. Although variable expression is known to be present in Marfan syndrome, phenotypic expression of Marfan syndrome in our patient might be masked by the co-occurrence of Down syndrome. (Neth Heart J 2009;1...

  9. The Fastest Saccadic Responses Escape Visual Masking

    DEFF Research Database (Denmark)

    M. Crouzet, Sébastien; Overgaard, Morten; Busch, Niko A.

    2014-01-01

    visual processing while the initial feedforward processing is thought to be left intact. We tested a prediction derived from this hypothesis: the fastest responses, being triggered before the beginning of reentrant processing, should escape the OSM interference. In a saccadic choice reaction time task......, which gives access to very early stages of visual processing, target visibility was reduced either by OSM, conventional backward masking, or low stimulus contrast. A general reduction of performance was observed in all three conditions. However, the fastest saccades did not show any sign of interference...

  10. Silicon germanium mask for deep silicon etching

    KAUST Repository

    Serry, Mohamed

    2014-07-29

    Polycrystalline silicon germanium (SiGe) can offer excellent etch selectivity to silicon during cryogenic deep reactive ion etching in an SF.sub.6/O.sub.2 plasma. Etch selectivity of over 800:1 (Si:SiGe) may be achieved at etch temperatures from -80 degrees Celsius to -140 degrees Celsius. High aspect ratio structures with high resolution may be patterned into Si substrates using SiGe as a hard mask layer for construction of microelectromechanical systems (MEMS) devices and semiconductor devices.

  11. On the relations between crowding and visual masking.

    Science.gov (United States)

    Huckauf, Anke; Heller, Dieter

    2004-05-01

    To study the question of which processes contribute to crowding and whether these are comparable to those of visual temporal masking, we varied the stimulus onset asynchrony (SOA) between target and flankers in a crowding setting. Monotonically increasing Type A masking functions observedfor small spacings and large eccentricities indicate that the integration of information from target and flankers underlies crowding. Decreasing masking functions obtained for large spacings and small eccentricities relate processes of crowding to those contributing to Type B masking. In addition, Type B masking was more frequent with letter-like nonletter flankers than with letter flankers, suggesting that Type B masking, just like crowding over large areas, is due to higher level interactions. The rapid decrease of the effects of interletter spacing and eccentricity with increasing SOA indicates that positional information is transient.

  12. The effect of vibrato on the recognition of masked vowels.

    Science.gov (United States)

    Demany, L; Semal, C

    1990-11-01

    Five experiments on the identifiability of synthetic vowels masked by wideband sounds are reported. In each experiment, identification thresholds (signal/masker ratios, in decibels) were measured for two versions of four vowels: a vibrated version, in which FO varied sinusoidally around 100 Hz; and a steady version, in which F0 was fixed at 100 Hz. The first three experiments were performed on naive subjects. Experiment 1 showed that for maskers consisting of bursts of pink noise, vibrato had no effect on thresholds. In Experiment 2, where the maskers were periodic pulse trains with an F0 randomly varied between 120 and 140 Hz from trial to trial, vibrato slightly improved thresholds when the sound pressure level of the maskers was 40 dB, but had no effect for 65-dB maskers. In Experiment 3, vibrated rather than steady pulse trains were used as maskers; when these maskers were at 40 dB, the vibrated versions of the vowels were slightly less identifiable than their steady versions; but, as in Experiment 2, vibrato had no effect when the maskers were at 65 dB. Experiment 4 showed that the unmasking effect of vibrato found in Experiment 2 disappeared in subjects trained in the identification task. Finally, Experiment 5 indicated that in trained listeners, vibrato had no influence on identification performance even when the maskers and the vowels had synchronous onsets and offsets. We conclude that vibrating a vowel masked by a wideband sound can affect its identification threshold, but only for tonal maskers and in untrained listeners. This effect of vibrato should probably be considered as a Gestalt phenomenon originating from central auditory mechanisms. PMID:2247326

  13. Sparse aperture mask wavefront sensor testbed results

    Science.gov (United States)

    Subedi, Hari; Zimmerman, Neil T.; Kasdin, N. Jeremy; Riggs, A. J. E.

    2016-07-01

    Coronagraphic exoplanet detection at very high contrast requires the estimation and control of low-order wave- front aberrations. At Princeton High Contrast Imaging Lab (PHCIL), we are working on a new technique that integrates a sparse-aperture mask (SAM) with a shaped pupil coronagraph (SPC) to make precise estimates of these low-order aberrations. We collect the starlight rejected from the coronagraphic image plane and interfere it using a sparse aperture mask (SAM) at the relay pupil to estimate the low-order aberrations. In our previous work we numerically demonstrated the efficacy of the technique, and proposed a method to sense and control these differential aberrations in broadband light. We also presented early testbed results in which the SAM was used to sense pointing errors. In this paper, we will briefly overview the SAM wavefront sensor technique, explain the design of the completed testbed, and report the experimental estimation results of the dominant low-order aberrations such as tip/tit, astigmatism and focus.

  14. Recent patents and patented technology platforms for pharmaceutical taste masking.

    Science.gov (United States)

    Kaushik, Deepak; Dureja, Harish

    2014-04-01

    Taste masking is an important factor in the development of oral dosage forms containing bitter active pharmaceutical ingredients. Currently numerous techniques are being applied to overcome this problem. Realizing this, several researchers and pharmaceutical companies are now engaged in developing novel techniques to address the problem of taste masking evident by numerous patents filed in this area in recent times. In this review the most recent patents for taste masking are discussed and how these patents overcome the limitations of conventional approaches of taste masking is also highlighted. Novel techniques based on some recent patents such as nanohybrid, melt extrusion, non-complex cyclodextrin compositions and off taste masking are providing new realms to taste masking of bitter drugs. The present article also provides an overview of various patented platform technologies based on different techniques/mechanisms employed for taste masking. The unique features and principles of taste-masking approaches used in various patented technologies are also discussed. A better understanding of these new patents and patented technologies will help researchers and pharmaceutical industries to select the appropriate platform, or to develop innovative products with improved taste masking properties. PMID:24499438

  15. Thermal management of masks for deep x-ray lithography.

    Energy Technology Data Exchange (ETDEWEB)

    Khounsary, A.; Chojnowski, D.; Mancini, D.C.; Lai, B.; Dejus, R.

    1997-11-18

    This paper addresses some options and techniques in the thermal management of masks used in deep x-ray lithography. The x-ray masks are thin plates made of low-atomic-number materials on which a patterned thin film of a high-atomic-number metal has been deposited. When they are exposed to an x-ray beam, part of the radiation is transmitted to replicate the pattern on a downstream photoresist, and the remainder is absorbed in the mask in the form of heat. This heat load can cause deformation of the mask and thus image distortion in the lithography process. The mask geometry considered in the present study is 100 mm x 100 mm in area, and about 0.1 to 2 mm thick. The incident radiation is a bending magnet x-ray beam having a footprint of 60 mm x 4 mm at the mask. The mask is scanned vertically about {+-} 30 mm so that a 60 mm x 60 mm area is exposed. the maximum absorbed heat load in the mask is 80 W, which is significantly greater than a few watts encountered in previous systems. In this paper, cooling techniques, substrate material selection, transient and steady state thermal and structural behavior, and other thermo-mechanical aspects of mask design are discussed. It is shown that, while diamond and graphite remain attractive candidates, at present beryllium is a more suitable material for this purpose and, when properly cooled, can provide the necessary dimensional tolerance.

  16. Practical mask inspection system with printability and pattern priority verification

    Science.gov (United States)

    Tsuchiya, Hideo; Ozaki, Fumio; Takahara, Kenichi; Inoue, Takafumi; Kikuiri, Nobutaka

    2011-05-01

    Through the four years of study in Association of Super-Advanced Electronics Technologies (ASET) on reducing mask manufacturing Turn Around Time (TAT) and cost, we have been able to establish a technology to improve the efficiency of the review process by applying a printability verification function that utilizes computational lithography simulations to analyze defects detected by a high-resolution mask inspection system. With the advent of Source-Mask Optimization (SMO) and other technologies that extend the life of existing optical lithography, it is becoming extremely difficult to judge a defect only by the shape of a mask pattern, while avoiding pseudo-defects. Thus, printability verification is indispensable for filtering out nuisance defects from high-resolution mask inspection results. When using computational lithography simulations to verify printability with high precision, the image captured by the inspection system must be prepared with extensive care. However, for practical applications, this preparation process needs to be simplified. In addition, utilizing Mask Data Rank (MDR) to vary the defect detection sensitivity according to the patterns is also useful for simultaneously inspecting minute patterns and avoiding pseudo-defects. Combining these two technologies, we believe practical mask inspection for next generation lithography is achievable. We have been improving the estimation accuracy of the printability verification function through discussion with several customers and evaluation of their masks. In this report, we will describe the progress of these practical mask verification functions developed through customers' evaluations.

  17. Masking Release for Igbo and English.

    Science.gov (United States)

    Ebem, Deborah U; Desloge, Joseph G; Reed, Charlotte M; Braida, Louis D; Uguru, Joy O

    2013-09-01

    In this research, we explored the effect of noise interruption rate on speech intelligibility. Specifically, we used the Hearing In Noise Test (HINT) procedure with the original HINT stimuli (English) and Igbo stimuli to assess speech reception ability in interrupted noise. For a given noise level, the HINT test provides an estimate of the signal-to-noise ratio (SNR) required for 50%-correct speech intelligibility. The SNR for 50%-correct intelligibility changes depending upon the interruption rate of the noise. This phenomenon (called Masking Release) has been studied extensively in English but not for Igbo - which is an African tonal language spoken predominantly in South Eastern Nigeria. This experiment explored and compared the phenomenon of Masking Release for (i) native English speakers listening to English, (ii) native Igbo speakers listening to English, and (iii) native Igbo speakers listening to Igbo. Since Igbo is a tonal language and English is a non-tonal language, this allowed us to compare Masking Release patterns on native speakers of tonal and non-tonal languages. Our results for native English speakers listening to English HINT show that the SNR and the masking release are orderly and consistent with other English HINT data for English speakers. Our result for Igbo speakers listening to English HINT sentences show that there is greater variability in results across the different Igbo listeners than across the English listeners. This result likely reflects different levels of ability in the English language across the Igbo listeners. The masking release values in dB are less than for English listeners. Our results for Igbo speakers listening to Igbo show that in general, the SNRs for Igbo sentences are lower than for English/English and Igbo/English. This means that the Igbo listeners could understand 50% of the Igbo sentences at SNRs less than those required for English sentences by either native or non-native listeners. This result can be

  18. Evaluation of SCAA mask technology as a pathway to the 65-nm node

    Science.gov (United States)

    Beach, James V.; Petersen, John S.; Maslow, Mark J.; Gerold, David J.; McCafferty, Diane C.

    2003-06-01

    This study takes an integrated approach utilizing a combination of high NA 193 nm lithography, a sidewall chrome alternating aperture (SCAA) phase shift mask, optical proximity correction (OPC) and customized illumination in an attempt to demonstrate the feasibility of using 193 nm lithography to support the 65 nm node. A SCAA mask was designed and built with line/space patterns ranging in pitch from 300 nm down to 140 nm. A range of mask biases were applied to the zero and pi spaces in order to examine to response of the lithography to a combination of the SCAA approach and asymmetric biasing. In combination to the asymmetric biasing, overlay bracketing was applied in order to measure the chrome overlay tolerances of the mask. Simulations suggested that an unconventionally small sigma of 0.15 would be the optimum coherence for a high 193 nm optical system. A custom 0.15 sigma partial coherence illuminator was, therefore, built and installed in the experimental ASML Micrascan V 0.75 NA 193 nm scanner. Wafers were exposed using 190 nm of 193 nm resist and an organic BARC. The 70 nm 1:1 line/space patterns resolved with a depth of focus of about 0.2 μm. The 75 nm 1:1 line/space patterns showed a 0.3-0.4 μm depth of focus. Both of these process windows were limited by pattern collapse. Addressing the pattern collapse may improve the depth of focus. Comparing mask measurements to wafer measurements show that little or no asymmetric biasing in necessary to balance the pitch. Moreover, the measured pitch was stable over a focus range of at least 0.4 microns demonstrating that any phase imbalance present was not significantly affecting the observed lithography.

  19. Nablus mask-like facial syndrome

    DEFF Research Database (Denmark)

    Allanson, Judith; Smith, Amanda; Hare, Heather;

    2012-01-01

    Nablus mask-like facial syndrome (NMLFS) has many distinctive phenotypic features, particularly tight glistening skin with reduced facial expression, blepharophimosis, telecanthus, bulky nasal tip, abnormal external ear architecture, upswept frontal hairline, and sparse eyebrows. Over the last fe...... that deletion of the 8q21.3q22.1 region is necessary but not sufficient for development of the NMLFS. We discuss possible genetic mechanisms underlying the complex pattern of inheritance for this condition....... heterozygous deletions significantly overlapping the region associated with NMLFS. Notably, while one mother and child were said to have mild tightening of facial skin, none of these individuals exhibited reduced facial expression or the classical facial phenotype of NMLFS. These findings indicate...

  20. Coherent diffractive imaging using randomly coded masks

    Energy Technology Data Exchange (ETDEWEB)

    Seaberg, Matthew H., E-mail: seaberg@slac.stanford.edu [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States); D' Aspremont, Alexandre [CNRS and D.I., UMR 8548, École Normale Supérieure, 45 Rue d' Ulm, 75005 Paris (France); Turner, Joshua J. [Linac Coherent Light Source, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025 (United States)

    2015-12-07

    We experimentally demonstrate an extension to coherent diffractive imaging that encodes additional information through the use of a series of randomly coded masks, removing the need for typical object-domain constraints while guaranteeing a unique solution to the phase retrieval problem. Phase retrieval is performed using a numerical convex relaxation routine known as “PhaseCut,” an iterative algorithm known for its stability and for its ability to find the global solution, which can be found efficiently and which is robust to noise. The experiment is performed using a laser diode at 532.2 nm, enabling rapid prototyping for future X-ray synchrotron and even free electron laser experiments.

  1. Micro-optical structures formed by a mask moving method

    Institute of Scientific and Technical Information of China (English)

    DU Chun-lei; DONG Xiao-chun; DENG Qi-ling; LUO Xian-gang

    2007-01-01

    An unique mask moving method is developed for forming effective micro-optical structures with continuous profile. The mechanism for forming different micro-optical profiles is disclosed, and the designed approach for binary moving mask is described. Finally some concrete micro-optical components with typical microstructures are presented for demonstrating the validity of the method.

  2. General Projective Synchronization and Fractional Order Chaotic Masking Scheme

    Institute of Scientific and Technical Information of China (English)

    Shi-Quan Shao

    2008-01-01

    In this paper, a fractional order chaotic masking scheme used for secure communication is introduced. Based on the general projective synchronization of two coupled fractional Chert systems, a popular masking scheme is designed. Numerical example is given to demonstrate the effectiveness of the proposed method.

  3. Optical vortex coronagraphy from soft spin-orbit masks

    CERN Document Server

    Aleksanyan, Artur

    2016-01-01

    We report on a soft route towards optical vortex coronagraphy based on self-engineered electrically tunable vortex masks based on liquid crystal topological defects. These results suggest that a Nature-assisted technological approach to the fabrication of complex phase masks could be useful in optical imaging whenever optical phase singularities are at play.

  4. Environment-aware ideal binary mask estimation using monaural cues

    DEFF Research Database (Denmark)

    May, Tobias; Dau, Torsten

    2013-01-01

    We present a monaural approach to speech segregation that estimates the ideal binary mask (IBM) by combining amplitude modulation spectrogram (AMS) features, pitch-based features and speech presence probability (SPP) features derived from noise statistics. To maintain a high mask estimation...... speech and noise presence are evaluated by considering adjacent TF units. The proposed system achieves high classification accuracy....

  5. Antireflective surface patterned by rolling mask lithography

    Science.gov (United States)

    Seitz, Oliver; Geddes, Joseph B.; Aryal, Mukti; Perez, Joseph; Wassei, Jonathan; McMackin, Ian; Kobrin, Boris

    2014-03-01

    A growing number of commercial products such as displays, solar panels, light emitting diodes (LEDs and OLEDs), automotive and architectural glass are driving demand for glass with high performance surfaces that offer anti-reflective, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet the desired performance characteristics or cannot be applied over large areas in a cost-effective manner. "Rolling Mask Lithography" (RML™) enables highresolution lithographic nano-patterning over large-areas at low-cost and high-throughput. RML is a photolithographic process performed using ultraviolet (UV) illumination transmitted through a soft cylindrical mask as it rolls across a substrate. Subsequent transfer of photoresist patterns into the substrate is achieved using an etching process, which creates a nanostructured surface. The current generation exposure tool is capable of patterning one-meter long substrates with a width of 300 mm. High-throughput and low-cost are achieved using continuous exposure of the resist by the cylindrical photomask. Here, we report on significant improvements in the application of RML™ to fabricate anti-reflective surfaces. Briefly, an optical surface can be made antireflective by "texturing" it with a nano-scale pattern to reduce the discontinuity in the index of refraction between the air and the bulk optical material. An array of cones, similar to the structure of a moth's eye, performs this way. Substrates are patterned using RML™ and etched to produce an array of cones with an aspect ratio of 3:1, which decreases the reflectivity below 0.1%.

  6. Effect of musical training on masking paradigm

    Directory of Open Access Journals (Sweden)

    N Devi

    2016-01-01

    Full Text Available Background: Musicians outperform nonmusicians on brainstem and cortical level processing. However, there are limited literature comparing musicians and nonmusicians on the overall release of masking abilities and correlation across otoacoustic emissions (OAEs, masking level difference (MLD and quick speech-in-noise (Quick-SIN. Aim: To investigate the physiological differences between musicians and nonmusicians by evaluating the effect of musical training on contralateral suppression (CAS of OAE, MLD, and Quick-SIN. Materials and Methods: Distortion product OAEs (DPOAEs recording with and without noise, MLD test using continuous (CMLD and pulsating pure tones (PMLD and Quick-SIN in Kannada were carried out on 15 musicians and 15 nonmusicians. Results: Musicians outperformed nonmusicians on Quick-SIN and CAS of OAEs. However, no significant difference was observed between two groups on CMLD and PMLD. There was a significant difference observed in CMLD, PMLD as well as suppression amplitude across frequencies tested in both groups. A significant difference between PMLD and CMLD was observed only for musicians at 2 kHz. In both groups, there was a significant level of correlation for CAS of DPOAE and Quick-SIN with CMLD and with PMLD between the parameters tested. Conclusion: The results of our finding suggest that CAS of DPOAE and Quick-SIN are sensitive tools to quantify the effect of musical training, compared to MLD. Musical training helps to strengthen afferent and efferent pathways, and hence it aids in speech perception abilities in noise. Hence, for the intervention of individuals with difficulties in speech perception in noise, musical training can be a choice to be considered. As well for appropriate diagnosis and interpretation, one needs to consider the musical experience of individual tested.

  7. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  8. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  9. AN AMELIORATED DETECTION STATISTICS FOR ADAPTIVE MASK MEDIAN FILTRATION OF HEAVILY NOISED DIGITAL IMAGES

    Directory of Open Access Journals (Sweden)

    Geeta Hanji

    2016-11-01

    Full Text Available Noise reduction is an important area of research in image processing applications. The performance of the digital image noise filtering method primarily depends upon the accuracy of noise detection scheme. This paper presents an effective detector based, adaptive mask, median filtration of heavily noised digital images affected with fixed value (or salt and pepper impulse noise. The proposed filter presents a novel approach; an ameliorated Rank Ordered Absolute Deviation (ROAD statistics to judge whether the input pixel is noised or noise free. If a pixel is detected as corrupted, it is subjected to adaptive mask median filtration; otherwise, it is kept unchanged. Extensive experimental results and comparative performance evaluations demonstrate that the proposed filter outperforms the existing decision type, median based filters with powerful noise detectors in terms of objective performance measures and visual retrieviation accuracy.

  10. Masks for high aspect ratio x-ray lithography

    Science.gov (United States)

    Malek, Chantal Khan; Jackson, Keith H.; Bonivert, William D.; Hruby, Jill

    1996-06-01

    The requirements for deep x-ray lithography (DXRL) masks are reviewed and a recently developed cost effective mask fabrication process is described. The review includes a summary of tabulated properties for materials used in the fabrication of DXRL masks. X-ray transparency and mask contrast are calculated for material combinations using simulations of exposure at the Advanced Light Source (ALS) at Berkeley, and compared to the requirements for standard x-ray lithography (XRL) mask technology. Guided by the requirements, a cost-effective fabrication process for manufacturing high contrast masks for DXRL has been developed. Thick absorber patterns (0960-1317/6/2/004/img7) on a thin silicon wafer (0960-1317/6/2/004/img8m) were made using contact printing in thick positive (Hoechst 4620) and negative (OCG 7020) photoresist and subsequent gold electrodeposition. Gold was deposited using a commercially available gold sulphite bath with low current density and good agitation. The resultant gold films were fine-grained and stress-free. Replication of such masks into 0960-1317/6/2/004/img9 thick acrylic sheets was performed at the ALS.

  11. Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin Edward; Belikov, Ruslan; Guyon, Olivier; Balasubramanian, Kunjithapatham; Wilson, Dan

    2013-01-01

    Recent advances in coronagraph technologies for exoplanet imaging have achieved contrasts close to 1e10 at 4 lambda/D and 1e-9 at 2 lambda/D in monochromatic light. A remaining technological challenge is to achieve high contrast in broadband light; a challenge that is largely limited by chromaticity of the focal plane mask. The size of a star image scales linearly with wavelength. Focal plane masks are typically the same size at all wavelengths, and must be sized for the longest wavelength in the observational band to avoid starlight leakage. However, this oversized mask blocks useful discovery space from the shorter wavelengths. We present here the design, development, and testing of an achromatic focal plane mask based on the concept of optical filtering by a diffractive optical element (DOE). The mask consists of an array of DOE cells, the combination of which functions as a wavelength filter with any desired amplitude and phase transmission. The effective size of the mask scales nearly linearly with wavelength, and allows significant improvement in the inner working angle of the coronagraph at shorter wavelengths. The design is applicable to almost any coronagraph configuration, and enables operation in a wider band of wavelengths than would otherwise be possible. We include initial results from a laboratory demonstration of the mask with the Phase Induced Amplitude Apodization coronagraph.

  12. GUSTATORY SYSTEM AND MASKING THE TASTE OF BITTER HERBS

    Directory of Open Access Journals (Sweden)

    Vinita Kale, Chetan Tapre and Abhay Ittadwar

    2013-11-01

    Full Text Available The oral route is the most easy and favorable route of drug administration. The development of oral formulations containing bitter herbs has widely been required in pharmaceutical and herbal industry. The human gustatory system is capable of identifying five major taste qualities: sweet, sour, salty, bitter and umami (savory. Different receptors and transduction mechanisms are involved in the detection of each taste quality. Many efforts have been focused to improve the palatability in these products that has prompted in the development of numerous techniques of taste masking. Once a method for taste masking is adopted, it becomes apparent to evaluate the effectiveness of the taste masked product. The major hurdle in evaluation of measuring the effectiveness of taste masking is that the taste is a highly subjective property and it varies demographically and with the age and gender. This communication gives a brief account of gustatory system, the receptor and transduction mechanism of bitter taste and various techniques used in taste masking of the bitters. The review also reveals the in-vitro and in-vivo methods for evaluating taste masked efficiency of developed product. Finally, the review concludes that proper choice of method for taste masking method is essential and it might depend on the properties of the herbs.

  13. Supercrowding: weakly masking a target expands the range of crowding.

    Science.gov (United States)

    Vickery, Timothy J; Shim, Won Mok; Chakravarthi, Ramakrishna; Jiang, Yuhong V; Luedeman, Robert

    2009-02-10

    Crowding is impairment of peripheral object identification by nearby objects. Critical spacing (the minimum target-flanker distance that does not produce crowding) scales with target eccentricity and is consistently reported as roughly equal to or less than 50% of target eccentricity (0.5e). This study demonstrates that crowding occurs far beyond the typical critical spacing when the target is weakly masked by a surrounding contour or backwards pattern mask. A target was presented at a peripheral location on every trial and participants reported its orientation. Flankers appeared at target-flanker distances of 0.3-0.7e, or were absent. The target was presented with or without a mask. When flankers were absent, the masks only mildly impaired performance. When flankers were present but the mask was absent, target identification was nearly perfect at wide target-flanker distances (0.5e-0.7e). However, when flankers were present and the target was masked, performance dropped significantly, even when target-flanker distances far exceeded the typical crowding range. This phenomenon ("supercrowding") shares critical features with standard crowding: flankers similar to the target impair performance more than dissimilar flankers, and the characteristic anisotropic profile of crowding is preserved. Supercrowding may reflect a general interaction between crowding and other forms of masking.

  14. Application of DBM tool for detection of EUV mask defect

    Science.gov (United States)

    Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Yang, Hyunjo; Yim, Donggyu; Park, Byeongjun; Maruyama, Kotaro; Yamamoto, Masahiro

    2013-04-01

    Extreme ultraviolet lithography (EUVL) is one of the most leading lithography technologies for high volume manufacturing. The EUVL is based on reflective optic system therefore critical patterning issues are arisen from the surface of photomask. Defects below and inside of the multilayer or absorber of EUV photomask is one of the most critical issues to implement EUV lithography in mass production. It is very important to pick out and repair printable mask defects. Unfortunately, however, infrastructure for securing the defect free photomask such as inspection tool is still under development furthermore it does not seem to be ready soon. In order to overcome the lack of infrastructures for EUV mask inspection, we will discuss an alternative methodology which is based on wafer inspection results using DBM (Design Based Metrology) tool. It is very challenging for metrology to quantify real mask defect from wafer inspection result since various sources are possible contributor. One of them is random defect comes from poor CD uniformity. It is probable that those random defects are majority of a defect list including real mask defects. It is obvious that CD uniformity should be considered to pick out only a real mask defect. In this paper, the methodology to determine real mask defect from the wafer inspection results will be discussed. Experiments are carried out on contact layer and on metal layer using mask defect inspection tool, Teron(KLA6xx) and DBM (Design Based Metrology) tool, NGR2170™.

  15. New method of contour-based mask-shape compiler

    Science.gov (United States)

    Matsuoka, Ryoichi; Sugiyama, Akiyuki; Onizawa, Akira; Sato, Hidetoshi; Toyoda, Yasutaka

    2007-10-01

    We have developed a new method of accurately profiling a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, it is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method for a DFM solution in which two dimensional data are extracted for an error free practical simulation by precise reproduction of a real mask shape in addition to the mask data simulation. The flow centering around the design data is fully automated and provides an environment where optimization and verification for fully automated model calibration with much less error is available. It also allows complete consolidation of input and output functions with an EDA system by constructing a design data oriented system structure. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

  16. Simulation of AIMS measurements using rigorous mask 3D modeling

    Science.gov (United States)

    Chou, Chih-Shiang; Huang, Hsu-Ting; Chu, Fu-Sheng; Chu, Yuan-Chih; Huang, Wen-Chun; Liu, Ru-Gun; Gau, Tsai-Sheng

    2015-03-01

    Aerial image measurement system (AIMSTM) has been widely used for wafer level inspection of mask defects. Reported inspection flows include die-to-die (D2D) and die-to-database (D2DB) methods. For patterns that do not repeat in another die, only the D2DB approach is applicable. The D2DB method requires accurate simulation of AIMS measurements for a mask pattern. An optical vectorial model is needed to depict the mask diffraction effect in this simulation. To accurately simulate the imaging results, a rigorous electro-magnetic field (EMF) model is essential to correctly take account of the EMF scattering induced by the mask topography, which is usually called the mask 3D effect. In this study, the mask 3D model we use is rigorous coupled-wave analysis (RCWA), which calculates the diffraction fields from a single plane wave incidence. A hybrid Hopkins-Abbe method with RCWA is used to calculate the EMF diffraction at a desired accuracy level while keeping the computation time practical. We will compare the speed of the hybrid Hopkins-Abbe method to the rigorous Abbe method. The matching between simulation and experiment is more challenging for AIMS than CD-SEM because its measurements provide full intensity information. Parameters in the mask 3D model such as film stack thickness or film optical properties, is optimized during the fitting process. We will report the fitting results of AIMS images for twodimensional structures with various pitches. By accurately simulating the AIMS measurements, it provides a necessary tool to perform the mask inspection using the D2DB approach and to accurately predict the mask defects.

  17. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  18. Should we judge a mask by its cover?

    OpenAIRE

    Jeffrey, A. A.; Warren, P. M.

    1992-01-01

    BACKGROUND: A table of the approximate ranges of inspired oxygen delivered at given oxygen flow rates is often given on the packaging of oxygen masks. A study was carried out to check the inspired oxygen concentration given by one of the new masks, which has been designed to be used with or without the Venturi attachment as a result of the proposal to use it without the Venturi attachment as a general purpose mask for emergency use. METHODS: Measurements were made at resting respiratory rate ...

  19. 自吸附式防尘口罩专利技术研究%Study of Patent Technology for Self-adsorption Dust Mask

    Institute of Scientific and Technical Information of China (English)

    刘莎; 沈婷婷; 曹志强

    2015-01-01

    The dust removal rate,masks tightness and permeability of self-adsorption dust mask jointly affect the per⁃formance of dust masks,the author combed the development of patent technology from the four aspects,a brief intro⁃duction of self-adsorption dust mask technology development route was conducted.%自吸附式防尘口罩的除尘率、口罩的密封性、透气性四者共同影响防尘口罩的性能,笔者从这四个方面对专利进行技术发展脉络梳理,简要介绍自吸附式防尘口罩技术的发展路线。

  20. Open-loop frequency response for a chaotic masking system

    Institute of Scientific and Technical Information of China (English)

    Huang Xian-Gao; Yu Pei; Huang Wei

    2006-01-01

    In this paper, a new numerical simulation approach is proposed for the study of open-loop frequency response of a chaotic masking system. Using Chua's circuit and the Lorenz system as illustrative examples, we have shown that one can employ chaos synchronization to separate the feedback network from a chaotic masking system, and then use numerical simulation to obtain the open-loop synchronization response, the phase response, and the amplitude response of a chaotic masking system. Based on the analysis of the frequency response, we have also proved that changing the amplitude of the exciting (input) signal within normal working domain does not influence the frequency response of the chaotic masking system. The new numerical simulation method developed in this paper can be extended to consider the open-loop frequency response of other systems described by differential or difference equations.

  1. Kuldne Mask Tallinnasssssss! / Sergei Zhenovatsh ; interv. Hellar Bergmann

    Index Scriptorium Estoniae

    Zhenovatsh, Sergei

    2008-01-01

    Lavastaja Sergei Zhenovatsh oma Teatrikunsti Stuudiost, noortest näitlejatest, Eestist. Lavastaja on Eestis teatrifestivali "Kuldne mask Eestis" raames. 10.-11. okt. etendus Tallinnas, Salme Kultuurikeskuses Nikolai Gogoli näidend "Mängurid"

  2. Comparison of three methods in improving bag mask ventilation

    Directory of Open Access Journals (Sweden)

    Samad EJ Golzari

    2014-01-01

    Conclusions: Leaving dentures in place in edentulous patients after inducing anesthesia improves bag-mask ventilation. However, placing folded compressed gauze in buccal space leads to more significant improvement in BMV compared to leaving dentures in place.

  3. Coronagraph-Integrated Wavefront Sensing with a Sparse Aperture Mask

    CERN Document Server

    Subedi, Hari; Kasdin, N Jeremy; Cavanagh, Kathleen; Riggs, A J Eldorado

    2015-01-01

    Stellar coronagraph performance is highly sensitive to optical aberrations. In order to effectively suppress starlight for exoplanet imaging applications, low-order wavefront aberrations entering a coronagraph such as tip-tilt, defocus and coma must be determined and compensated. Previous authors have established the utility of pupil-plane masks (both non-redundant/sparse-aperture and generally asymmetric aperture masks) for wavefront sensing. Here we show how a sparse aperture mask (SAM) can be integrated with a coronagraph to measure low-order, differential phase aberrations. Starlight rejected by the coronagraph's focal plane stop is collimated to a relay pupil, where the mask forms an interference fringe pattern on a subsequent detector. Our numerical Fourier propagation models show that the information encoded in the fringe intensity distortions is sufficient to accurately discriminate and estimate Zernike phase modes extending from tip-tilt up to radial degree $n=5$, with amplitude up to $\\lambda/20$ RM...

  4. The effect of masking in the attentional dwell time paradigm

    DEFF Research Database (Denmark)

    Petersen, Anders

    2009-01-01

    A temporary functional blindness to the second of two spatially separated targets has been identified in numerous studies of temporal visual attention. This effect is known as attentional dwell time and is maximal 200 to 500 ms after presentation of the first target (e.g. Duncan, Ward, Shapiro......, 1994). In most studies of attentional dwell time, two masked targets have been used. Moore et al. (1996) have criticised the masking of the first target when measuring the attentional dwell time, finding a shorter attentional dwell time when the first mask was omitted. In the presented work, the effect...... an impairment of the second target. Hence, the attentional dwell time may be a combined effect arising from attending to both the first target and its mask....

  5. MISR radiometric camera-by-camera Cloud Mask V004

    Data.gov (United States)

    National Aeronautics and Space Administration — This file contains the Radiometric camera-by-camera Cloud Mask dataset. It is used to determine whether a scene is classified as clear or cloudy. A new parameter...

  6. Improve mask inspection capacity with Automatic Defect Classification (ADC)

    Science.gov (United States)

    Wang, Crystal; Ho, Steven; Guo, Eric; Wang, Kechang; Lakkapragada, Suresh; Yu, Jiao; Hu, Peter; Tolani, Vikram; Pang, Linyong

    2013-09-01

    As optical lithography continues to extend into low-k1 regime, resolution of mask patterns continues to diminish. The adoption of RET techniques like aggressive OPC, sub-resolution assist features combined with the requirements to detect even smaller defects on masks due to increasing MEEF, poses considerable challenges for mask inspection operators and engineers. Therefore a comprehensive approach is required in handling defects post-inspections by correctly identifying and classifying the real killer defects impacting the printability on wafer, and ignoring nuisance defect and false defects caused by inspection systems. This paper focuses on the results from the evaluation of Automatic Defect Classification (ADC) product at the SMIC mask shop for the 40nm technology node. Traditionally, each defect is manually examined and classified by the inspection operator based on a set of predefined rules and human judgment. At SMIC mask shop due to the significant total number of detected defects, manual classification is not cost-effective due to increased inspection cycle time, resulting in constrained mask inspection capacity, since the review has to be performed while the mask stays on the inspection system. Luminescent Technologies Automated Defect Classification (ADC) product offers a complete and systematic approach for defect disposition and classification offline, resulting in improved utilization of the current mask inspection capability. Based on results from implementation of ADC in SMIC mask production flow, there was around 20% improvement in the inspection capacity compared to the traditional flow. This approach of computationally reviewing defects post mask-inspection ensures no yield loss by qualifying reticles without the errors associated with operator mis-classification or human error. The ADC engine retrieves the high resolution inspection images and uses a decision-tree flow to classify a given defect. Some identification mechanisms adopted by ADC to

  7. Simulated masking of right whale sounds by shipping noise: incorporating a model of the auditory periphery.

    Science.gov (United States)

    Cunningham, Kane A; Mountain, David C

    2014-03-01

    Many species of large, mysticete whales are known to produce low-frequency communication sounds. These low-frequency sounds are susceptible to communication masking by shipping noise, which also tends to be low frequency in nature. The size of these species makes behavioral assessment of auditory capabilities in controlled, captive environments nearly impossible, and field-based playback experiments are expensive and necessarily limited in scope. Hence, it is desirable to produce a masking model for these species that can aid in determining the potential effects of shipping and other anthropogenic noises on these protected animals. The aim of this study was to build a model that combines a sophisticated representation of the auditory periphery with a spectrogram-based decision stage to predict masking levels. The output of this model can then be combined with a habitat-appropriate propagation model to calculate the potential effects of noise on communication range. For this study, the model was tested on three common North Atlantic right whale communication sounds, both to demonstrate the method and to probe how shipping noise affects the detection of sounds with varying spectral and temporal characteristics. PMID:24606298

  8. A phase mask fiber grating and sensing applications

    Directory of Open Access Journals (Sweden)

    Preecha P. Yupapin

    2003-09-01

    Full Text Available This paper presents an investigation of a fabricated fiber grating device characteristics and its applications, using a phase mask writing technique. The use of a most common UV phase laser (KrF eximer laser, with high intensity light source was focussed to the phase mask for writing on a fiber optic sample. The device (i.e. grating characteristic especially, in sensing application, was investigated. The possibility of using such device for temperature and strain sensors is discussed.

  9. On-line simulations of models for backward masking.

    Science.gov (United States)

    Francis, Gregory

    2003-11-01

    Five simulations of quantitative models of visual backward masking are available on the Internet at http://www.psych.purdue.edu/-gfrancis/Publications/BackwardMasking/. The simulations can be run in a Web browser that supports the Java programming language. This article describes the motivation for making the simulations available and gives a brief introduction as to how the simulations are used. The source code is available on the Web page, and this article describes how the code is organized. PMID:14748495

  10. Ferromagnetic shadow mask for spray coating of polymer patterns

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Bosco, Filippo; Boisen, Anja

    2013-01-01

    We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties of the...... shadow mask allow magnetic clamping to the substrate and spray coating of well defined polymer patterns....

  11. Bubble masks for time-encoded imaging of fast neutrons.

    Energy Technology Data Exchange (ETDEWEB)

    Brubaker, Erik; Brennan, James S.; Marleau, Peter; Nowack, Aaron B.; Steele, John; Sweany, Melinda; Throckmorton, Daniel J.

    2013-09-01

    Time-encoded imaging is an approach to directional radiation detection that is being developed at SNL with a focus on fast neutron directional detection. In this technique, a time modulation of a detected neutron signal is induced-typically, a moving mask that attenuates neutrons with a time structure that depends on the source position. An important challenge in time-encoded imaging is to develop high-resolution two-dimensional imaging capabilities; building a mechanically moving high-resolution mask presents challenges both theoretical and technical. We have investigated an alternative to mechanical masks that replaces the solid mask with a liquid such as mineral oil. Instead of fixed blocks of solid material that move in pre-defined patterns, the oil is contained in tubing structures, and carefully introduced air gaps-bubbles-propagate through the tubing, generating moving patterns of oil mask elements and air apertures. Compared to current moving-mask techniques, the bubble mask is simple, since mechanical motion is replaced by gravity-driven bubble propagation; it is flexible, since arbitrary bubble patterns can be generated by a software-controlled valve actuator; and it is potentially high performance, since the tubing and bubble size can be tuned for high-resolution imaging requirements. We have built and tested various single-tube mask elements, and will present results on bubble introduction and propagation as a function of tubing size and cross-sectional shape; real-time bubble position tracking; neutron source imaging tests; and reconstruction techniques demonstrated on simple test data as well as a simulated full detector system.

  12. Bubble masks for time-encoded imaging of fast neutrons.

    Energy Technology Data Exchange (ETDEWEB)

    Brubaker, Erik; Brennan, James S.; Marleau, Peter; Nowack, Aaron B.; Steele, John T.; Sweany, Melinda; Throckmorton, Daniel J.

    2013-09-01

    Time-encoded imaging is an approach to directional radiation detection that is being developed at SNL with a focus on fast neutron directional detection. In this technique, a time modulation of a detected neutron signal is inducedtypically, a moving mask that attenuates neutrons with a time structure that depends on the source position. An important challenge in time-encoded imaging is to develop high-resolution two-dimensional imaging capabilities; building a mechanically moving high-resolution mask presents challenges both theoretical and technical. We have investigated an alternative to mechanical masks that replaces the solid mask with a liquid such as mineral oil. Instead of fixed blocks of solid material that move in pre-defined patterns, the oil is contained in tubing structures, and carefully introduced air gapsbubblespropagate through the tubing, generating moving patterns of oil mask elements and air apertures. Compared to current moving-mask techniques, the bubble mask is simple, since mechanical motion is replaced by gravity-driven bubble propagation; it is flexible, since arbitrary bubble patterns can be generated by a software-controlled valve actuator; and it is potentially high performance, since the tubing and bubble size can be tuned for high-resolution imaging requirements. We have built and tested various single-tube mask elements, and will present results on bubble introduction and propagation as a function of tubing size and cross-sectional shape; real-time bubble position tracking; neutron source imaging tests; and reconstruction techniques demonstrated on simple test data as well as a simulated full detector system.

  13. Figure-ground segmentation by transferring window masks

    OpenAIRE

    Kuettel, D.; Ferrari, V.

    2012-01-01

    We present a novel technique for figure-ground segmentation, where the goal is to separate all foreground objects in a test image from the background. We decompose the test image and all images in a supervised training set into overlapping windows likely to cover foreground objects. The key idea is to transfer segmentation masks from training windows that are visually similar to windows in the test image. These transferred masks are then used to derive the unary potentials of a binary, pairwi...

  14. Cloud and Cloud Shadow Masking Using Multi-Temporal Cloud Masking Algorithm in Tropical Environmental

    Science.gov (United States)

    Candra, D. S.; Phinn, S.; Scarth, P.

    2016-06-01

    A cloud masking approach based on multi-temporal satellite images is proposed. The basic idea of this approach is to detect cloud and cloud shadow by using the difference reflectance values between clear pixels and cloud and cloud shadow contaminated pixels. Several bands of satellite image which have big difference values are selected for developing Multi-temporal Cloud Masking (MCM) algorithm. Some experimental analyses are conducted by using Landsat-8 images. Band 3 and band 4 are selected because they can distinguish between cloud and non cloud. Afterwards, band 5 and band 6 are used to distinguish between cloud shadow and clear. The results show that the MCM algorithm can detect cloud and cloud shadow appropriately. Moreover, qualitative and quantitative assessments are conducted using visual inspections and confusion matrix, respectively, to evaluate the reliability of this algorithm. Comparison between this algorithm and QA band are conducted to prove the reliability of the approach. The results show that MCM better than QA band and the accuracy of the results are very high.

  15. Soyinka and Yoruba Sculpture: Masks of Deification and Symbolism

    Directory of Open Access Journals (Sweden)

    Gilbert Tarka Fai

    2010-01-01

    Full Text Available The Yoruba mask is a piece of sculpture that is both artistic and functional. The carved work fulfils one or more of several functions—sacred or profane, personal or communal, serious or satirical. As an object it has only its relatively insignificant quota of vital energy that is found, according to African ontology, in all matter and substance of the visible world- animal, vegetable and mineral. But the Yoruba mask also has a force that extends to the world of spirits and gods. These masks also have the dual effect of transforming the wearer and the ambivalence of serving good and evil ends. This indicates that the Yoruba mask apart from its spiritual essence is a symbol of great complexity and ambiguity. It is from this great community of sculptors and from the ambivalent quality of the mask as image and symbol that some of Wole Soyinka’s creative writings emerge. This paper argues that Wole Soyinka uses his native Yoruba sculpture, and the mask in particular, to dramatise the essential spiritual continuity of human nature through the dramatic appearance of gods and the spirits of the ancestors in the world of the living during the dance of possession.

  16. A physiological ear model for the emulation of masking.

    Science.gov (United States)

    Baumgarte, F

    1999-01-01

    Auditory masking is exploited in technical audio systems for transmission and storage to improve the perceived audio quality. In this respect, perception models are necessary for a masked threshold prediction to quantify the threshold of audibility for a given signal or distortion. The presented ear model emulates those parts of the auditory sound processing which are relevant to masking. The physiological modeling approach is not limited to simple masker-test-signal configurations as usually employed in psychoacoustical measurements, but it is valid for complex signals as well, which is desired in the aforementioned applications. The ear model includes a nonlinear active cochlear model which emulates the basic mechanisms effective in masking: excitation and suppression. Nonlinear mechanical amplification by means of the outer hair cells plays a crucial role in proper modeling of these effects. In addition to physiological measurements at the mechanical level of sound processing in the cochlea, classical masking patterns and nonlinear masking effects are demonstrated by the ear model. PMID:10529651

  17. Gentle masking of low-complexity sequences improves homology search.

    Directory of Open Access Journals (Sweden)

    Martin C Frith

    Full Text Available Detection of sequences that are homologous, i.e. descended from a common ancestor, is a fundamental task in computational biology. This task is confounded by low-complexity tracts (such as atatatatatat, which arise frequently and independently, causing strong similarities that are not homologies. There has been much research on identifying low-complexity tracts, but little research on how to treat them during homology search. We propose to find homologies by aligning sequences with "gentle" masking of low-complexity tracts. Gentle masking means that the match score involving a masked letter is min(0,S, where S is the unmasked score. Gentle masking slightly but noticeably improves the sensitivity of homology search (compared to "harsh" masking, without harming specificity. We show examples in three useful homology search problems: detection of NUMTs (nuclear copies of mitochondrial DNA, recruitment of metagenomic DNA reads to reference genomes, and pseudogene detection. Gentle masking is currently the best way to treat low-complexity tracts during homology search.

  18. Translucency and Masking Ability of Various Composite Resins at Different Thicknesses

    Directory of Open Access Journals (Sweden)

    Farideh Darabi

    2014-09-01

    Full Text Available Statement of the Problem: Optical properties of the composite resins, concerning their translucency and thickness, are affected by discolored tooth structure or inherent darkness of the oral cavity. Purpose: This study aimed to compare the translucency parameter (TP of five different composite resins in different thicknesses and to evaluate their masking ability in black backgrounds. Materials and Method: Five brands of composite resins; Gradia (GC and Crystalline (Confi-dental in opaque A2 (OA2, Vit-l-escence (Ultradent in opaque snow (OS, Herculite XRV (Kerr and Opallis (FGM in dentin A2 (DA2 shades were selected to enroll the study. Color coordinates of each composite were determined at 0.5, 1, and 1.5 mm thicknesses on a white backing, the backing of material itself and a black backing were calculated by using a spectrophotometer to evaluate the translucency parameter (TP of the study materials. The masking ability was also calculated from the specimens on the material itself and on black backing. The values under 2 were estimated as im-perceptible. One-way ANOVA, T-test and Tukey HSD were employed for statistical analysis. Results: The masking ability values, recorded for the 1.5 mm-thick specimens, were in the range of imperceptible except for the Herculite. There was no difference in TP values of the materials at 1.5 mm thickness. Opaque snow shade of Vit-l-escence and opaque A2 shade of Gradia showed lower TP values in comparison with the other 1 and 0.5 mm-thick materials and this difference was statistically significant (p< 0.05. Conclusion: In relatively thin thicknesses (≤1mm, these opaque/dentin shade composite resins could not mask the black background color.

  19. Planck CMB Anomalies: Astrophysical and Cosmological Secondary Effects and the Curse of Masking

    Science.gov (United States)

    Rassat, Anais

    2016-07-01

    Large-scale anomalies have been reported in CMB data with both WMAP and Planck data. These could be due to foreground residuals and or systematic effects, though their confirmation with Planck data suggests they are not due to a problem in the WMAP or Planck pipelines. If these anomalies are in fact primordial, then understanding their origin is fundamental to either validate the standard model of cosmology or to explore new physics. We investigate three other possible issues: 1) the trade-off between minimising systematics due to foreground contamination (with a conservative mask) and minimising systematics due to masking, 2) astrophysical secondary effects (the kinetic Doppler quadrupole and kinetic Sunyaev-Zel'dovich effect), and 3) secondary cosmological signals (the integrated Sachs-Wolfe effect). We address the masking issue by considering new procedures that use both WMAP and Planck to produce higher quality full-sky maps using the sparsity methodology (LGMCA maps). We show the impact of masking is dominant over that of residual foregrounds, and the LGMCA full-sky maps can be used without further processing to study anomalies. We consider four official Planck PR1 and two LGMCA CMB maps. Analysis of the observed CMB maps shows that only the low quadrupole and quadrupole-octopole alignment seem significant, but that the planar octopole, Axis of Evil, mirror parity and cold spot are not significant in nearly all maps considered. After subtraction of astrophysical and cosmological secondary effects, only the low quadrupole may still be considered anomalous, meaning the significance of only one anomaly is affected by secondary effect subtraction out of six anomalies considered. In the spirit of reproducible research all reconstructed maps and codes are available online.

  20. The time-course of visual masking effects on saccadic responses indicates that masking interferes with reentrant processing

    DEFF Research Database (Denmark)

    Crouzet, S.; Pin, Simon Hviid Del; Overgaard, Morten;

    2013-01-01

    with reentrant processing, then the first feedforward sweep should be left relatively intact. Using a standard OSM paradigm in combination with a saccadic choice task, giving access to an early phase of visual processing (the fastest saccades occurring only 100 ms after target onset), we compared the masking...... time-course of OSM, noise backward masking, as well as a simple target contrast decrease. Consistently with a reentrant account, a significantly stronger masking effect was observed for slow (larger than median RT; average median RT = 177 ms) relatively to fast saccades in the OSM condition....... Interestingly, the same result was observed using backward masking. In a follow-up experiment, where we assessed observer’s visual awareness using single-trial visibility ratings, we demonstrated that these ultra-fast responses were actually linked to subsequent reported visibility. Taken together...

  1. A procedure and program to calculate shuttle mask advantage

    Science.gov (United States)

    Balasinski, A.; Cetin, J.; Kahng, A.; Xu, X.

    2006-10-01

    A well-known recipe for reducing mask cost component in product development is to place non-redundant elements of layout databases related to multiple products on one reticle plate [1,2]. Such reticles are known as multi-product, multi-layer, or, in general, multi-IP masks. The composition of the mask set should minimize not only the layout placement cost, but also the cost of the manufacturing process, design flow setup, and product design and introduction to market. An important factor is the quality check which should be expeditious and enable thorough visual verification to avoid costly modifications once the data is transferred to the mask shop. In this work, in order to enable the layer placement and quality check procedure, we proposed an algorithm where mask layers are first lined up according to the price and field tone [3]. Then, depending on the product die size, expected fab throughput, and scribeline requirements, the subsequent product layers are placed on the masks with different grades. The actual reduction of this concept to practice allowed us to understand the tradeoffs between the automation of layer placement and setup related constraints. For example, the limited options of the numbers of layer per plate dictated by the die size and other design feedback, made us consider layer pairing based not only on the final price of the mask set, but also on the cost of mask design and fab-friendliness. We showed that it may be advantageous to introduce manual layer pairing to ensure that, e.g., all interconnect layers would be placed on the same plate, allowing for easy and simultaneous design fixes. Another enhancement was to allow some flexibility in mixing and matching of the layers such that non-critical ones requiring low mask grade would be placed in a less restrictive way, to reduce the count of orphan layers. In summary, we created a program to automatically propose and visualize shuttle mask architecture for design verification, with

  2. Impact of topographic mask models on scanner matching solutions

    Science.gov (United States)

    Tyminski, Jacek K.; Pomplun, Jan; Renwick, Stephen P.

    2014-03-01

    Of keen interest to the IC industry are advanced computational lithography applications such as Optical Proximity Correction of IC layouts (OPC), scanner matching by optical proximity effect matching (OPEM), and Source Optimization (SO) and Source-Mask Optimization (SMO) used as advanced reticle enhancement techniques. The success of these tasks is strongly dependent on the integrity of the lithographic simulators used in computational lithography (CL) optimizers. Lithographic mask models used by these simulators are key drivers impacting the accuracy of the image predications, and as a consequence, determine the validity of these CL solutions. Much of the CL work involves Kirchhoff mask models, a.k.a. thin masks approximation, simplifying the treatment of the mask near-field images. On the other hand, imaging models for hyper-NA scanner require that the interactions of the illumination fields with the mask topography be rigorously accounted for, by numerically solving Maxwell's Equations. The simulators used to predict the image formation in the hyper-NA scanners must rigorously treat the masks topography and its interaction with the scanner illuminators. Such imaging models come at a high computational cost and pose challenging accuracy vs. compute time tradeoffs. Additional complication comes from the fact that the performance metrics used in computational lithography tasks show highly non-linear response to the optimization parameters. Finally, the number of patterns used for tasks such as OPC, OPEM, SO, or SMO range from tens to hundreds. These requirements determine the complexity and the workload of the lithography optimization tasks. The tools to build rigorous imaging optimizers based on first-principles governing imaging in scanners are available, but the quantifiable benefits they might provide are not very well understood. To quantify the performance of OPE matching solutions, we have compared the results of various imaging optimization trials obtained

  3. Laser dynamical reservoir computing with consistency: an approach of a chaos mask signal.

    Science.gov (United States)

    Nakayama, Joma; Kanno, Kazutaka; Uchida, Atsushi

    2016-04-18

    We numerically investigate reservoir computing based on the consistency of a semiconductor laser subjected to optical feedback and injection. We introduce a chaos mask signal as an input temporal mask for reservoir computing and perform a time-series prediction task. We compare the errors of the task obtained from the chaos mask signal with those obtained from other digital and analog masks. The performance of the prediction task can be improved by using the chaos mask signal due to complex dynamical response.

  4. Design of reconfigurable and structured spiral phase mask for optical security system

    Science.gov (United States)

    Lin, Chao; Shen, Xueju

    2016-07-01

    We propose the design and use of structured spiral phase mask as keys in optical security systems. A protocol for the generation of this deterministic and reconfigurable phase mask is demonstrated. Experimental results of the proposed phase masks employed in the double random phase encoding (DRPE) system is presented. To show the advantages of this structured phase mask (SPM) over the random phase mask (RPM), both the encryption and decryption behaviors of the SPM and RPM are compared.

  5. Correction: Inferior alveolar nerve injury with laryngeal mask airway: a case report.

    LENUS (Irish Health Repository)

    Hanumanthaiah, Deepak

    2011-11-30

    ABSTRACT: Following the publication of our article [Inferior alveolar nerve injury with laryngeal mask airway: a case report. Journal of Medical Case Reports 2011, 5:122] it was brought to our attention that we inadvertently used the registered trademark of the Laryngeal Mask Company Limited (LMA) as the abbreviation for laryngeal mask airway. A Portex(R) Soft Seal(R) Laryngeal Mask was used and not a device manufactured by the Laryngeal Mask Company.

  6. Defects caused by blank masks and repair solution with nanomachining for 20nm node

    Science.gov (United States)

    Lee, HyeMi; Kim, ByungJu; Kim, MunSik; Jung, HoYong; Kim, Sang Pyo; Yim, DongGyu

    2014-09-01

    As the number of masks per wafer product set is increasing and low k1 lithography requires tight mask specifications, the patterning process below sub 20nm tech. node for critical layers will be much more expensive compared with previous tech. generations. Besides, the improved resolution and the zero defect level are necessary to meet tighter specifications on a mask and these resulted in the increased the blank mask price as well as the mask fabrication cost. Unfortunately, in spite of expensive price of blank masks, the certain number of defects on the blank mask is transformed into the mask defects and its ratio is increased. But using high quality blank mask is not a good idea to avoid defects on the blank mask because the price of a blank mask is proportional to specifications related to defect level. Furthermore, particular defects generated from the specific process during manufacturing a blank mask are detected as a smaller defect than real size by blank inspection tools because of its physical properties. As a result, it is almost impossible to prevent defects caused by blank masks during the mask manufacturing. In this paper, blank defect types which is evolved into mask defects and its unique characteristics are observed. Also, the repair issues are reviewed such as the pattern damage according to the defect types and the repair solution is suggested to satisfy the AIMS (Arial Image Measurement System) specification using a nanomachining tool.

  7. Social mask or persona in Tennesse Williams's women chracters

    Directory of Open Access Journals (Sweden)

    Filiz Çevik Tan

    2014-04-01

    Full Text Available Common etymon of word “personality” in foreign languages is based on the word “persona”. Meaning of the word “persona”, in latin, is the mask the stage actors use. Jung, defining the “Persona” as a concept within the scope of analytic psychology, sees it as a functional cover, a form of spiritual behavior, which responds to daily needs of the person. When both definitions are read simultaneously the “persona” shall become the “social mask”. In brief; in order to receive acknowledgement-and not to be excluded, and to acquire some sort of things, social masks (personas suitable with communal codes that one is a part of are used. Our social masks in this sense are our face that people around us see and recognize. Maintaining the personality within “normal” borders is dependent on persona’s motion and its transmutation when needed. Play characters, too, have social masks. In this study, a review was performed out of chosen play scripts on play persons who use the social masks that undertake key roles in the stack of encoded social relationships.

  8. The effects of alerting signals in masked priming

    Directory of Open Access Journals (Sweden)

    Rico eFischer

    2013-07-01

    Full Text Available Alerting signals often serve to reduce temporal uncertainty by predicting the time of stimulus onset. The resulting response time benefits have often been explained by facilitated translation of stimulus codes into response codes on the basis of established stimulus-response (S-R links. In paradigms of masked S-R priming alerting signals also modulate response activation processes triggered by subliminally presented prime stimuli. In the present study we tested whether facilitation of visuo-motor translation processes due to alerting signals critically depends on established S-R links. Alerting signals resulted in significantly enhanced masked priming effects for masked prime stimuli that included and that did not include established S-R links (i.e., target vs. novel primes. Yet, the alerting-priming interaction was more pronounced for target than for novel primes. These results suggest that effects of alerting signals on masked priming are especially evident when S-R links between prime and target exist. At the same time, an alerting-priming interaction also for novel primes suggests that alerting signals also facilitate stimulus-response translation processes when masked prime stimuli provide action-trigger conditions in terms of programmed S-R links.

  9. Spatial release from simultaneous echo masking in bat sonar.

    Science.gov (United States)

    Warnecke, Michaela; Bates, Mary E; Flores, Victoria; Simmons, James A

    2014-05-01

    Big brown bats (Eptesicus fuscus) use biosonar to navigate and locate objects in their surroundings. During natural foraging, they often encounter echoes returned by a target of interest located to the front while other, often stronger, clutter echoes are returned from objects, such as vegetation, located to the sides or above. Nevertheless, bats behave as if they do not suffer interference from this clutter. Using a two-choice delay discrimination procedure, bats were tested for the masking effectiveness of clutter echoes on target echoes when the target echoes were delivered from the bat's front while clutter echoes were delivered from 90° overhead, a direction of lowpass filtering by the external ears. When clutter echoes are presented from the front at the same delay as target echoes, detection performance declines and clutter masking occurs. When the clutter echoes are presented at the same delay but from overhead, discrimination performance is unaffected and no masking occurs. Thus there is masking release for simultaneous off-axis lowpass clutter compared to masking by simultaneous clutter from the front. The bat's performance for simultaneous target and clutter echoes indicates a new role for the mechanism that separates overlapping echoes by decomposing the bat's auditory time-frequency representation.

  10. Automatic pattern localization across layout database and photolithography mask

    Science.gov (United States)

    Morey, Philippe; Brault, Frederic; Beisser, Eric; Ache, Oliver; Röth, Klaus-Dieter

    2016-03-01

    Advanced process photolithography masks require more and more controls for registration versus design and critical dimension uniformity (CDU). The distribution of the measurement points should be distributed all over the whole mask and may be denser in areas critical to wafer overlay requirements. This means that some, if not many, of theses controls should be made inside the customer die and may use non-dedicated patterns. It is then mandatory to access the original layout database to select patterns for the metrology process. Finding hundreds of relevant patterns in a database containing billions of polygons may be possible, but in addition, it is mandatory to create the complete metrology job fast and reliable. Combining, on one hand, a software expertise in mask databases processing and, on the other hand, advanced skills in control and registration equipment, we have developed a Mask Dataprep Station able to select an appropriate number of measurement targets and their positions in a huge database and automatically create measurement jobs on the corresponding area on the mask for the registration metrology system. In addition, the required design clips are generated from the database in order to perform the rendering procedure on the metrology system. This new methodology has been validated on real production line for the most advanced process. This paper presents the main challenges that we have faced, as well as some results on the global performances.

  11. Investigation on full 6" masks using innovative solutions for direct physico-chemical analyses of mask contamination and haze

    Science.gov (United States)

    Dussault, L.; Pelissier, B.; Dufaye, F.; Gough, S.; Hamonne, J.; Chaix-Pluchery, O.; Sergent, P.; Tissier, M.

    2011-03-01

    The aim of this study is to determine the different types of haze contamination that occur in industrial conditions, using direct physico-chemical analyses on full 6" masks leaving their pellicle intact. Contaminated masks coming from end users (ST - France) or masks fab (Toppan Photomask) have been analysed. First, references XPS analyses on specially designed blanks from Toppan have been performed. Four references have been studied by angle resolved XPS. These studies show the absence of nitrogen and sulfur contamination on SiO2 side for the four references. On Cr side, a weak residual sulfur contamination has been observed as well as a very significant nitrogen concentration for the masks treated with a standard process. Concerning the masks treated with a sulfate free process, on Cr side, no residual sulfur has been detected by XPS, whereas few trace of nitrogen amount has been detected. Then a mask coming from the ST fab contaminated in real industrial conditions has been studied with several complementary characterisation techniques such as XPS, SEM, Raman and Tof-SIMS. Theses analyses confirm that the back glass haze on the mask is on a particle form. Two types of defects have been found: small particles (a few μm size), having a stick shape, with a very typical form indicating a crystal growth mechanism, and big particles (a few 10 μm size).The detailed physico-chemical results show the composition of the particles. Raman and Tof-Sims clearly show that small particle (with a stick form) are made of ammonium sulfate (NH4)2SO4 crystals. XPS, Raman and Tof-Sims indicate that big particles are a nitrogen containing polymer with a weak sulphate contamination.

  12. Comparison of volume-controlled and pressure-controlled ventilation using a laryngeal mask airway during gynecological laparoscopy

    OpenAIRE

    Jeon, Woo Jae; Cho, Sang Yun; Bang, Mi Rang; Ko, So-Young

    2011-01-01

    Background Several publications have reported the successful, safe use of Laryngeal Mask Airway (LMA)-Classic devices in patients undergoing laparoscopic surgery. However, there have been no studies that have examined the application of volume-controlled ventilation (VCV) or pressure-controlled ventilation (PCV) using a LMA during gynecological laparoscopy. The aim of this study is to compare how the VCV and PCV modes and using a LMA affect the pulmonary mechanics, the gas exchange and the ca...

  13. Study of Object Substitution Masking Using Event-related Potential

    Science.gov (United States)

    Nuruki, Atsuo; Yamada, Masafumi; Kawabata, Takuro; Shimozono, Tomoyuki; Yunokuchi, Kazutomo

    We make use of especially visual information though we are using a lot of information among modality in daily life. However, there is a difference between the real world and the perception of visual world. For instance, conscious perception of a briefly presented target can be reduced by a subsequent dot mask that does not touch it. However, the theory of this phenomenon, called Object Substitution Masking (OSM), is not clear. We investigated this issue by examining the effect of OSM on the N170 component of the event-related potential (ERP). As expected, subsequent dot mask significantly reduced accuracy in identifying the target. The N170 amplitude of P4 was also diminished by OSM. It was suggested that OSM is concerned in right posterior parietal cortex.

  14. An aperture masking mode for the MICADO instrument

    CERN Document Server

    Lacour, S; Gendron, E; Boccaletti, A; Galicher, R; Clénet, Y; Gratadour, D; Buey, T; Rousset, G; Hartl, M; Davies, R

    2014-01-01

    MICADO is a near-IR camera for the Europea ELT, featuring an extended field (75" diameter) for imaging, and also spectrographic and high contrast imaging capabilities. It has been chosen by ESO as one of the two first-light instruments. Although it is ultimately aimed at being fed by the MCAO module called MAORY, MICADO will come with an internal SCAO system that will be complementary to it and will deliver a high performance on axis correction, suitable for coronagraphic and pupil masking applications. The basis of the pupil masking approach is to ensure the stability of the optical transfer function, even in the case of residual errors after AO correction (due to non common path errors and quasi-static aberrations). Preliminary designs of pupil masks are presented. Trade-offs and technical choices, especially regarding redundancy and pupil tracking, are explained.

  15. Formulation and evaluation of dispersible taste masked tablet of roxithromycin

    Directory of Open Access Journals (Sweden)

    Mundada A

    2008-01-01

    Full Text Available Roxithromycin is a broad spectrum, semisynthetic macrolide antibiotic, having bitter taste. In the present study, an attempt has been made to mask the bitter taste of roxithromycin by complexation technique. Weak cation exchange resins Indion 214 and Amberlite IRP64, polymer carbopol 934P were used in formulation of complexes with the drug. The loading process was optimized for the pH of loading solution and resin or polymer:drug ratio. The complexes were evaluated for bulk density, angle of repose, taste masking, and in vitro drug release. In vitro drug release studies showed more than 80% drug release from the optimized formulation within 30 min. Amberlite IRP64 was found to be better complexing agent for masking the bitter taste of roxithromycin.

  16. Video encryption using chaotic masks in joint transform correlator

    International Nuclear Information System (INIS)

    A real-time optical video encryption technique using a chaotic map has been reported. In the proposed technique, each frame of video is encrypted using two different chaotic random phase masks in the joint transform correlator architecture. The different chaotic random phase masks can be obtained either by using different iteration levels or by using different seed values of the chaotic map. The use of different chaotic random phase masks makes the decryption process very complex for an unauthorized person. Optical, as well as digital, methods can be used for video encryption but the decryption is possible only digitally. To further enhance the security of the system, the key parameters of the chaotic map are encoded using RSA (Rivest–Shamir–Adleman) public key encryption. Numerical simulations are carried out to validate the proposed technique. (paper)

  17. Computation of reflected images from extreme ultraviolet masks

    Science.gov (United States)

    Bollepalli, Srinivas B.; Cerrina, Franco

    1999-06-01

    With EUV lithography emerging as a promising technology for semiconductor device fabrication with critical dimensions EQ 100 nm, it is of importance to understand the image formation process in detail. The proposed setup includes a reflective mask consisting of an absorbing material over- coated on a stack of multilayers and 4X de-magnifying optics. In this paper we consider the reflective mask alone i.e. excluding the condenser system and the optics and characterize the reflective properties of the extreme ultra violet mask. In particular, we show the effects caused due to diffraction, non-uniformities in the multilayer stack due to substrate defects, and partial spatial coherence. Several simulation examples are presented.

  18. Individually different weighting of multiple processes underlies effects of metacontrast masking.

    Science.gov (United States)

    Albrecht, Thorsten; Mattler, Uwe

    2016-05-01

    Metacontrast masking occurs when a mask follows a target stimulus in close spatial proximity. Target visibility varies with stimulus onset asynchrony (SOA) between target and mask in individually different ways leading to different masking functions with corresponding phenomenological reports. We used individual differences to determine the processes that underlie metacontrast masking. We assessed individual masking functions in a masked target discrimination task using different masking conditions and applied factor-analytical techniques on measures of sensitivity. Results yielded two latent variables that (1) contribute to performance with short and long SOA, respectively, (2) relate to specific stimulus features, and (3) differentially correlate with specific subjective percepts. We propose that each latent variable reflects a specific process. Two additional processes may contribute to performance with short and long SOAs, respectively. Discrimination performance in metacontrast masking results from individually different weightings of two to four processes, each of which contributes to specific subjective percepts. PMID:27010825

  19. Effect of SPM-based cleaning POR on EUV mask performance

    Science.gov (United States)

    Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

    2011-11-01

    EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

  20. Designing to win in sub-90nm mask production

    Science.gov (United States)

    Zhang, Yuan

    2005-11-01

    An informal survey conducted with key customers by Photronics indicates that the time gap between technology nodes has accelerated in recent years. Previously the cycle was three years. However, between 130nm and 90nm there was less than a 2 year gap, and between 90nm and 65nm a 1.5 year gap exists. As a result, the technical challenges have increased substantially. In addition, mask costs are rising exponentially due to high capital equipment cost, a shrinking customer base, long write times and increased applications of 193nm EAPSM or AAPSM. Collaboration among EDA companies, mask houses and wafer manufacturers is now more important than ever. This paper will explore avenues for reducing mask costs, mainly in the areas of: write-time reduction through design for manufacturing (DFM), and yield improvement through specification relaxation. Our study conducted through layout vertex modeling suggests that a simple design shape such as a square versus a circle or an angled structure helps reduce shot count and write time. Shot count reduction through mask layout optimization, and advancement in new generation E-beam writers can reduce write time up to 65%. An advanced laser writer can produce those less critical E-beam layers in less than half the time of an e-beam writer. Additionally, the emerging imprint lithography brings new life and new challenges to the photomask industry with applications in many fields outside of the semiconductor industry. As immersion lithography is introduced for 45nm device production, polarization and MEEF effects due to the mask will become severe. Larger magnification not only provides benefits on CD control and MEEF, but also extends the life time of current 90nm/65nm tool sets where 45nm mask sets can be produced at a lower cost.

  1. The Model 80 face mask fit-tester

    Energy Technology Data Exchange (ETDEWEB)

    Pasternack, A.

    1978-06-01

    Leakage from a face mask can be measured quantitatively using ethylene or sulphur hexafluoride as tracer gas. Either ethylene detector tubes or a leak detector are used with a hood which fits over the head of the person tested. The tester can be used for training, to give the wearer a feeling for the correct placement of the face mask and for tightening the straps. It can also be used to check tightness when the hair-style or shape of beard is changed.

  2. Planarization of topography with spin-on carbon hard mask

    Science.gov (United States)

    Noya, Go; Hama, Yusuke; Ishii, Maki; Nakasugi, Shigemasa; Kudo, Takanori; Padmanaban, Munirathna

    2016-03-01

    Spin-on-carbon hard mask (SOC HM) has been used in semiconductor manufacturing since 45nm node as an alternative carbon hard mask process to chemical vapor deposition (CVD). As advancement of semiconductor to 2X nm nodes and beyond, multiple patterning technology is used and planarization of topography become more important and challenging ever before. In order to develop next generation SOC, one of focuses is planarization of topography. SOC with different concepts for improved planarization and the influence of thermal flow temperature, crosslink, film shrinkage, baking conditions on planarization and filling performance are described in this paper.

  3. Does Masking Matter? Shipping Noise and Fish Vocalizations.

    Science.gov (United States)

    Neenan, Sarah T V; Piper, Rayner; White, Paul R; Kemp, Paul; Leighton, Timothy G; Shaw, Peter J

    2016-01-01

    Shipping creates large near-field background noises at levels similar to or higher than fish vocalizations and in the same critical bandwidths. This noise has the potential to "mask" biologically important signals and prevent fish from hearing them; any interference with the detection and recognition of sounds may impact fish survival. The Lombard effect, whereby vocalizations are altered to reduce or exclude masking effects, is an adaptation that has been observed in mammals and birds. Research is needed to establish whether the Lombard effect occurs in fish to gain a better understanding of the implications of noise pollution on fish populations. PMID:26611028

  4. Effect of Ceramic Thickness and Luting Agent Shade on the Color Masking Ability of Laminate Veneers.

    Science.gov (United States)

    Begum, Zubeda; Chheda, Pratik; Shruthi, C S; Sonika, Radhika

    2014-12-01

    The main objective of the study was to recognize the effect of ceramic thickness and luting agent on the extent to which the restoration masks color variations that may be present in the underlying dental structure. Two pressable ceramics were used: Lithium disilicate reinforced (IPS e.max- Ivoclar Vivadent) and Leucite reinforced (Cergo- Dentsply). Fifteen ceramic discs were manufactured from each ceramic and divided into three groups, according to the thickness (0.5, 1, 1.5 mm). To simulate the color of a dark underlying dental structure, background discs, color C3, with 20 mm diameter, were made using resin composite. The ceramic discs with varying thicknesses were seated on the dark background of the resin composite with either resinous opaque cement or resinous cement. The color parameters were determined by the CIE Lab system of colors using a spectrophotometer and color differences (ΔE) were calculated. The results were then statistically analyzed, using ANOVA test and Tukey HSD test. The ΔE values of both ceramic systems were affected by both the luting agent and the ceramic thickness (P veneers, higher values in the color parameters were obtained for both ceramic materials. The color masking ability of ceramics used for laminate veneers is significantly affected by the thickness of the ceramic and the shade of the luting agent used. PMID:26199491

  5. Mask synthesis and verification based on geometric model for surface micro-machined MEMS

    Institute of Scientific and Technical Information of China (English)

    LI Jian-hua; LIU Yu-sheng; GAO Shu-ming

    2005-01-01

    Traditional MEMS (microelectromechanical system) design methodology is not a structured method and has become an obstacle for MEMS creative design. In this paper, a novel method of mask synthesis and verification for surface micro-machined MEMS is proposed, which is based on the geometric model of a MEMS device. The emphasis is focused on synthesizing the masks at the basis of the layer model generated from the geometric model of the MEMS device. The method is comprised of several steps: the correction of the layer model, the generation of initial masks and final masks including multi-layer etch masks, and mask simulation. Finally some test results are given.

  6. Actinic Mask Inspection at the ALS Initial Design Review

    Energy Technology Data Exchange (ETDEWEB)

    Barty, A; Chapman, H; Sweeney, D; Levesque, R; Bokor, J; Gullikson, E; Jong, S; Liu, Y; Yi, M; Denbeaux, G; Goldberg, K; Naulleau, P; Denham, P; Rekawa, S; Baston, P; Tackaberry, R; Barale, P

    2003-03-05

    This report is the first milestone report for the actinic mask blank inspection project conducted at the VNL, which forms sub-section 3 of the Q1 2003 mask blank technology transfer program at the VNL. Specifically this report addresses deliverable 3.1.1--design review and preliminary tool design. The goal of this project is to design an actinic mask inspection tool capable of operating in two modes: high-speed scanning for the detection of multilayer defects (inspection mode), and a high-resolution aerial image mode in which the image emulates the imaging illumination conditions of a stepper system (aerial image or AIM mode). The purpose and objective of these two modes is as follows: (1) Defect inspection mode--This imaging mode is designed to scan large areas of the mask for defects EUV multilayer coatings. The goal is to detect the presence of multilayer defects on a mask blank and to store the co-ordinates for subsequent review in AIM mode, thus it is not essential that the illumination and imaging conditions match that of a production stepper. Potential uses for this imaging mode include: (a) Correlating the results obtained using actinic inspection with results obtained using other non-EUV defect inspection systems to verify that the non-EUV scanning systems are detecting all critical defects; (b) Gaining sufficient information to associate defects with particular processes, such as various stages of the multilayer deposition or different modes of operation of the deposition tool; and (c) Assessing the density and EUV impact of surface and multilayer anomalies. Because of the low defect density achieved using current multilayer coating technology it is necessary to be able to efficiently scan large areas of the mask in order to obtain sufficient statistics for use in cross-correlation experiments. Speed of operation as well as sensitivity is therefore key to operation in defect inspection mode. (2) Aerial Image Microscope (AIM) mode--In AIM mode the tool is

  7. Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

    Science.gov (United States)

    Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

    2015-10-01

    EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface. Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning. Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

  8. Challenges and technical requirements for multi-beam mask writer development

    Science.gov (United States)

    Lee, Sang Hee; Choi, Jin; Lee, Ho June; Shin, In Kyun; Tamamushi, Shuichi; Jeon, Chan-Uk

    2014-07-01

    Because mask patterning quality of CD uniformity, MTT, registration and smaller assist feature size is important for wafer patterning, the higher exposure dose and complex pattern design will be necessary. It is the reason why the faster and more accurate e-beam mask writer is needed for future design node. Multi-beam mask writer is the most promising new e-beam mask writer technology for future sub-10nm device mask patterning to solve the pattern quality issue and writing time problem. In this report, the technical challenges of multi-beam mask writer are discussed by comparison with problems of current VSB e-beam mask writer. Comparing with e-beam mask writer which has the critical issues of beam size and position control, the application of entirely different methods and techniques of CD and position control is essential for multi-beam mask writer which has new architecture and writing strategy. Using the simulation method, we present the different challenges between VSB and multi-beam mask writer. And there are many important technical requirements to achieve expected specification of multi-beam mask writer. To understand such requirements, the patterning simulation and mathematical calculation are done for analysis. Based on the patterning simulation, the detail technical requirements and issues of multi-beam mask writer are achieved. Consequently, we suggest the direction of multi-beam mask writer development in terms of technical challenges and requirements.

  9. Effects of mask fitness and worker education on the prevention of occupational dust exposure

    Directory of Open Access Journals (Sweden)

    Nishide,Tadashi

    2008-04-01

    Full Text Available To decrease the incidence of pneumoconiosis, we examined dust protective mask performance and its relation to pulmonary function as well as the effects of worker education on the proper wearing of masks. One hundred and seventy-eight workers from 15 factories subject to dust exposure participated in this study. All participants were interviewed to obtain relevant personal information and underwent both a mask leakage and a pulmonary function test. The mask leakage was expressed as a percentage, with under 10% leakage indicating that the dust protective mask worked efficiently. In addition, 23 workers from 2 factories were educated on how to wear masks properly. The average mask leakage was 24.3%, and 58% of workers wore ineffective masks. Though pulmonary function was almost normal, the percent vital capacity (%VC tended to be lower depending on the mask leakage. Mask education, which was very easy and took only a short time, dramatically decreased average mask leakage from 32.1% to 10.5% (p0.001. Educating workers to wear masks properly might prevent the worsening of pulmonary function in response to dust exposure. Appropriate mask fitness by education could be useful in preventing the development of pneumoconiosis.

  10. Experimental demonstration of binary shaped pupil mask coronagraphs for telescopes with obscured pupils

    CERN Document Server

    Haze, Kanae; Abe, Lyu; Takahashi, Aoi; Kotani, Takayuki; Yamamuro, Tomoyasu

    2016-01-01

    We present the fabrication and experimental demonstration of three free-standing binary shaped pupil mask coronagraphs, which are applicable for telescopes with partially obscured pupils. Three masks, designed to be complementary (labeled Mask-A, Mask-B, and Mask-C), were formed in 5 micron thick nickel. The design of Mask-A is based on a one-dimensional barcode mask. The design principle of Mask-B is similar, but has a smaller inner working angle and a lower contrast than Mask-A. Mask-C is based on a concentric ring mask and provides the widest dark region and a symmetric point spread function. Mask-A and Mask-C were both designed to produce a flexibly tailored dark region (i.e., non-uniform contrast). The contrast was evaluated using a light source comprising a broadband super-luminescent light-emitting diode with a center wavelength of 650 nm, and the measurements were carried out in a large vacuum chamber. Active wavefront control was not applied in this work. The coronagraphic images obtained by experime...

  11. Constructing optimized binary masks for reservoir computing with delay systems.

    Science.gov (United States)

    Appeltant, Lennert; Van der Sande, Guy; Danckaert, Jan; Fischer, Ingo

    2014-01-01

    Reservoir computing is a novel bio-inspired computing method, capable of solving complex tasks in a computationally efficient way. It has recently been successfully implemented using delayed feedback systems, allowing to reduce the hardware complexity of brain-inspired computers drastically. In this approach, the pre-processing procedure relies on the definition of a temporal mask which serves as a scaled time-mutiplexing of the input. Originally, random masks had been chosen, motivated by the random connectivity in reservoirs. This random generation can sometimes fail. Moreover, for hardware implementations random generation is not ideal due to its complexity and the requirement for trial and error. We outline a procedure to reliably construct an optimal mask pattern in terms of multipurpose performance, derived from the concept of maximum length sequences. Not only does this ensure the creation of the shortest possible mask that leads to maximum variability in the reservoir states for the given reservoir, it also allows for an interpretation of the statistical significance of the provided training samples for the task at hand.

  12. Immunologically-based methods for detecting masked mycotoxins

    Science.gov (United States)

    Masked mycotoxins are generally described as including unknown mycotoxins, non-extractable forms of known mycotoxins, or untargeted forms of known mycotoxins. Immunoassays can be developed with either broad cross-reaction to mycotoxin congeners or with high selectivity for a particular toxin. The re...

  13. Matching profiles of masked perpetrators: a pilot study

    DEFF Research Database (Denmark)

    Lynnerup, Niels; Bojesen, Sophie; Kuhlman, Michael Bilde

    2010-01-01

    indicate the possible matches, and perhaps even the best match, which may be helpful in police investigations, but it would not carry enough weight to be used as evidence per se. This study only focused on the profile. Future studies will use surface laser scans to analyse congruence between masked...

  14. "Kuldne mask" - hea vene teater Eestis / Laur Kaunissaare

    Index Scriptorium Estoniae

    Kaunissaare, Laur, 1982-

    2009-01-01

    6.-13. okt. Tallinnas ja Jõhvis toimuvast Venemaa rahvuslikust teatrifestivalist "Kuldne mask Eestis". Festivali lavastustest - Temur Tšheidze "Onukese unenägu", Declan Donnellan "Kaheteistkümnes öö", Lev Erenburgi "Äike" ja Alvis Hermanise "Šukšini jutustused"

  15. 42 CFR 84.110 - Gas masks; description.

    Science.gov (United States)

    2010-10-01

    ... 42 Public Health 1 2010-10-01 2010-10-01 false Gas masks; description. 84.110 Section 84.110 Public Health PUBLIC HEALTH SERVICE, DEPARTMENT OF HEALTH AND HUMAN SERVICES OCCUPATIONAL SAFETY AND... specific gas or vapor), or those which generate high heats or reaction with sorbent materials in...

  16. High Reading Skills Mask Dyslexia in Gifted Children

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H.; Slot, Esther M.; de Bree, Elise H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with…

  17. Generalization of Supervised Learning for Binary Mask Estimation

    DEFF Research Database (Denmark)

    May, Tobias; Gerkmann, Timo

    2014-01-01

    This paper addresses the problem of speech segregation by es- timating the ideal binary mask (IBM) from noisy speech. Two methods will be compared, one supervised learning approach that incorporates a priori knowledge about the feature distri- bution observed during training. The second method...

  18. Evidence for Early Morphological Decomposition: Combining Masked Priming with Magnetoencephalography

    Science.gov (United States)

    Lehtonen, Minna; Monahan, Philip J.; Poeppel, David

    2011-01-01

    Are words stored as morphologically structured representations? If so, when during word recognition are morphological pieces accessed? Recent masked priming studies support models that assume early decomposition of (potentially) morphologically complex words. The electrophysiological evidence, however, is inconsistent. We combined masked…

  19. Estimation of the Ideal Binary Mask using Directional Systems

    DEFF Research Database (Denmark)

    Boldt, Jesper; Kjems, Ulrik; Pedersen, Michael Syskind;

    2008-01-01

    and the requirements to enable calculations of the ideal binary mask using a directional system without the availability of the unmixed signals. The proposed method has a low complexity and is verified using computer simulation in both ideal and non-ideal setups showing promising results....

  20. Coronagraph-integrated wavefront sensing with a sparse aperture mask

    Science.gov (United States)

    Subedi, Hari; Zimmerman, Neil T.; Kasdin, N. Jeremy; Cavanagh, Kathleen; Riggs, A. J. Eldorado

    2015-07-01

    Stellar coronagraph performance is highly sensitive to optical aberrations. In order to effectively suppress starlight for exoplanet imaging applications, low-order wavefront aberrations entering a coronagraph, such as tip-tilt, defocus, and coma, must be determined and compensated. Previous authors have established the utility of pupil-plane masks (both nonredundant/sparse-aperture and generally asymmetric aperture masks) for wavefront sensing (WFS). Here, we show how a sparse aperture mask (SAM) can be integrated with a coronagraph to measure low-order differential phase aberrations. Starlight rejected by the coronagraph's focal plane stop is collimated to a relay pupil, where the mask forms an interference fringe pattern on a subsequent detector. Our numerical Fourier propagation models show that the information encoded in the fringe intensity distortions is sufficient to accurately discriminate and estimate Zernike phase modes extending from tip-tilt up to radial degree n=5, with amplitude up to λ/20 RMS. The SAM sensor can be integrated with both Lyot and shaped pupil coronagraphs at no detriment to the science beam quality. We characterize the reconstruction accuracy and the performance under low flux/short exposure time conditions, and place it in context of other coronagraph WFS schemes.

  1. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, Sietske; Kroesbergen, Evelyn; Slot, Esther; de Bree, Elise

    2014-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia

  2. General Projective Synchronization and Fractional Order Chaotic Masking Scheme

    Institute of Scientific and Technical Information of China (English)

    Shi-Quan Shao

    2008-01-01

    In this paper, a fractional order chaoticmasking scheme used for secure communication isintroduced. Based on the general projectivesynchronization of two coupled fractional Chen systems,a popular masking scheme is designed. Numericalexample is given to demonstrate the effectiveness of theproposed method.

  3. Efficient scan mask techniques for connected components labeling algorithm

    Directory of Open Access Journals (Sweden)

    Sutheebanjard Phaisarn

    2011-01-01

    Full Text Available Abstract Block-based connected components labeling is by far the fastest algorithm to label the connected components in 2D binary images, especially when the image size is quite large. This algorithm produces a decision tree that contains 211 leaf nodes with 14 levels for the depth of a tree and an average depth of 1.5923. This article attempts to provide a faster method for connected components labeling. We propose two new scan masks for connected components labeling, namely, the pixel-based scan mask and the block-based scan mask. In the final stage, the block-based scan mask is transformed to a near-optimal decision tree. We conducted comparative experiments using different sources of images for examining the performance of the proposed method against the existing methods. We also performed an average tree depth analysis and tree balance analysis to consolidate the performance improvement over the existing methods. Most significantly, the proposed method produces a decision tree containing 86 leaf nodes with 12 levels for the depth of a tree and an average depth of 1.4593, resulting in faster execution time, especially when the foreground density is equal to or greater than the background density of the images.

  4. Mask characterization for CDU budget breakdown in advanced EUV lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  5. Critical band masking reveals the effects of optical distortions on the channel mediating letter identification.

    Science.gov (United States)

    Young, Laura K; Smithson, Hannah E

    2014-01-01

    There is evidence that letter identification is mediated by only a narrow band of spatial frequencies and that the center frequency of the neural channel thought to underlie this selectivity is related to the size of the letters. When letters are spatially filtered (at a fixed size) the channel tuning characteristics change according to the properties of the spatial filter (Majaj et al., 2002). Optical aberrations in the eye act to spatially filter the image formed on the retina-their effect is generally to attenuate high frequencies more than low frequencies but often in a non-monotonic way. We might expect the change in the spatial frequency spectrum caused by the aberration to predict the shift in channel tuning observed for aberrated letters. We show that this is not the case. We used critical-band masking to estimate channel-tuning in the presence of three types of aberration-defocus, coma and secondary astigmatism. We found that the maximum masking was shifted to lower frequencies in the presence of an aberration and that this result was not simply predicted by the spatial-frequency-dependent degradation in image quality, assessed via metrics that have previously been shown to correlate well with performance loss in the presence of an aberration. We show that if image quality effects are taken into account (using visual Strehl metrics), the neural channel required to model the data is shifted to lower frequencies compared to the control (no-aberration) condition. Additionally, we show that when spurious resolution (caused by π phase shifts in the optical transfer function) in the image is masked, the channel tuning properties for aberrated letters are affected, suggesting that there may be interference between visual channels. Even in the presence of simulated aberrations, whose properties change from trial-to-trial, observers exhibit flexibility in selecting the spatial frequencies that support letter identification. PMID:25324794

  6. Critical band masking reveals the effects of optical distortions on the channel mediating letter identification

    Directory of Open Access Journals (Sweden)

    Laura eYoung

    2014-09-01

    Full Text Available There is evidence that letter identification is mediated by only a narrow band of spatial frequencies and that the centre frequency of the neural channel thought to underlie this selectivity is related to the size of the letters. When letters are spatially filtered (at a fixed size the channel tuning characteristics change according to the properties of the spatial filter (Majaj et al., 2002. Optical aberrations in the eye act to spatially filter the image formed on the retina - their effect is generally to attenuate high frequencies more than low frequencies but often in a non-monotonic way. We might expect the change in the spatial frequency spectrum caused by the aberration to predict the shift in channel tuning observed for aberrated letters. We show that this is not the case. We used critical-band masking to estimate channel-tuning in the presence of three types of aberration - defocus, coma and secondary astigmatism. We found that the maximum masking was shifted to lower frequencies in the presence of an aberration and that this result was not simply predicted by the spatial-frequency-dependent degradation in image quality, assessed via metrics that have previously been shown to correlate well with performance loss in the presence of an aberration. We show that if image quality effects are taken into account (using visual Strehl metrics, the neural channel required to model the data is shifted to lower frequencies compared to the control (no-aberration condition. Additionally, we show that when spurious resolution (caused by π phase shifts in the optical transfer function in the image is masked, the channel tuning properties for aberrated letters are affected, suggesting that there may be interference between visual channels. Even in the presence of simulated aberrations, whose properties change from trial-to-trial, observers exhibit flexibility in selecting the spatial frequencies that support letter identification.

  7. Sub-Optical Lithography With Nanometer Definition Masks

    Science.gov (United States)

    Hartley, Frank T.; Malek, Chantal Khan; Neogi, Jayant

    2000-01-01

    Nanometer feature size lithography represents a major paradigm shift for the electronics and micro-electro-mechanical industries. In this paper, we discuss the capacity of dynamic focused reactive ion beam (FIB) etching systems to undertake direct and highly anisotropic erosion of thick evaporated gold coatings on boron-doped silicon X-ray mask membranes. FIB offers a new level of flexibility in micro fabrication, allowing for fast fabrication of X-ray masks, where pattern definition and surface alteration are combined in the same step which eliminates the whole lithographic process, in particular resist, resist development, electro-deposition and resist removal. Focused ion beam diameters as small as 7 nm can be obtained enabling fabrication well into the sub-20 nm regime. In preliminary demonstrations of this X-ray mask fabrication technique 22 nm width lines were milled directly through 0.9 microns of gold and a miniature mass spectrometer pattern was milled through over 0.5 microns of gold. Also presented are the results of the shadow printing, using the large depth of field of synchrotron high energy parallel X-ray beam, of these and other sub-optical defined patterns in photoresist conformally coated over surfaces of extreme topographical variation. Assuming that electronic circuits and/or micro devices scale proportionally, the surface area of devices processed with X-ray lithography and 20 nm critical dimension X-ray masks would be 0.5% that of contemporary devices (350 nm CD). The 20 CD mask fabrication represents an initial effort - a further factor of three reduction is anticipated which represents a further order-of-magnitude reduction in die area.

  8. Airway obstruction and gas leak during mask ventilation of preterm infants in the delivery room.

    LENUS (Irish Health Repository)

    2011-07-01

    Preterm infants with inadequate breathing receive positive pressure ventilation (PPV) by mask with variable success. The authors examined recordings of PPV given to preterm infants in the delivery room for prevalence of mask leak and airway obstruction.

  9. Simple solution for difficult face mask ventilation in children with orofacial clefts.

    Science.gov (United States)

    Veerabathula, Prardhana; Patil, Manajeet; Upputuri, Omkar; Durga, Padmaja

    2014-10-01

    Significant air leak from the facial cleft predisposes to difficult mask ventilation. The reported techniques of use of sterile gauze, larger face mask and laryngeal mask airway after intravenous induction have limited application in uncooperative children. We describe the use of dental impression material molded to the facial contour to cover the facial defect and aid ventilation with an appropriate size face mask in a child with a bilateral Tessier 3 anomaly.

  10. The impact of mass flow and masking on the pressure drop of air filter in heavy-duty diesel engine

    Directory of Open Access Journals (Sweden)

    Gorji-Bandpy Mofid

    2012-04-01

    Full Text Available This paper presents a computational fluid dynamics (CFD calculation approach to predict and evaluate the impact of the mass-flow inlet on the pressure drop of turbocharger`s air filtfer in heavy-duty diesel engine. The numerical computations were carried out using a commercial CFD program whereas the inlet area of the air filter consisted of several holes connected to a channel. After entering through the channel, the air passes among the holes and enters the air filter. The effect of masking holes and hydraulic diameter is studied and investigated on pressure drop. The results indicate that pressure drop increase with decreasing of hydraulic diameter and masking of the holes has considerable affect on the pressure drop.

  11. Influence of anthropogenic transformation of the forest ecosystems in Easten Fennoscandia on the populations of pygmy and masked shrews

    Directory of Open Access Journals (Sweden)

    Ivanter Ernest

    2014-11-01

    Full Text Available According to the long-term (1965-2013 stationary and expedition studies in the Easten Fennoscandia, different species of shrews react differently to clear-cutting and the formation of transformed anthropogenic landscape. The dominant species (common shrew increases in the number in these conditions, however, the population becomes unstable, and the number fluctuates severely from year to year and from season to season (Kurhinen et al., 2006, but the other species - pygmy shrew (Sorex minutus L. and masked shrew (Sorex caecutiens Laxm. – respond to these changes otherwise. The first one reduces in the number, especially in highly transformed habitats, but in general, its populations acquire the necessary stability and sustainability, while the masked shrew is affected by the massive lumbering negatively. Nevertheless, the latter is regularly found in the newly formed coniferous plantations emerging after the radical forest devastation.

  12. The impact of mass flow and masking on the pressure drop of air filter in heavy-duty diesel engine

    Science.gov (United States)

    Hoseeinzadeh, Sepideh; Gorji-Bandpy, Mofid

    2012-04-01

    This paper presents a computational fluid dynamics (CFD) calculation approach to predict and evaluate the impact of the mass-flow inlet on the pressure drop of turbocharger`s air filtfer in heavy-duty diesel engine. The numerical computations were carried out using a commercial CFD program whereas the inlet area of the air filter consisted of several holes connected to a channel. After entering through the channel, the air passes among the holes and enters the air filter. The effect of masking holes and hydraulic diameter is studied and investigated on pressure drop. The results indicate that pressure drop increase with decreasing of hydraulic diameter and masking of the holes has considerable affect on the pressure drop.

  13. Selective-area growth of GaN nanowires on SiO2-masked Si (111) substrates by molecular beam epitaxy

    Science.gov (United States)

    Kruse, J. E.; Lymperakis, L.; Eftychis, S.; Adikimenakis, A.; Doundoulakis, G.; Tsagaraki, K.; Androulidaki, M.; Olziersky, A.; Dimitrakis, P.; Ioannou-Sougleridis, V.; Normand, P.; Koukoula, T.; Kehagias, Th.; Komninou, Ph.; Konstantinidis, G.; Georgakilas, A.

    2016-06-01

    We analyze a method to selectively grow straight, vertical gallium nitride nanowires by plasma-assisted molecular beam epitaxy (MBE) at sites specified by a silicon oxide mask, which is thermally grown on silicon (111) substrates and patterned by electron-beam lithography and reactive-ion etching. The investigated method requires only one single molecular beam epitaxy MBE growth process, i.e., the SiO2 mask is formed on silicon instead of on a previously grown GaN or AlN buffer layer. We present a systematic and analytical study involving various mask patterns, characterization by scanning electron microscopy, transmission electron microscopy, and photoluminescence spectroscopy, as well as numerical simulations, to evaluate how the dimensions (window diameter and spacing) of the mask affect the distribution of the nanowires, their morphology, and alignment, as well as their photonic properties. Capabilities and limitations for this method of selective-area growth of nanowires have been identified. A window diameter less than 50 nm and a window spacing larger than 500 nm can provide single nanowire nucleation in nearly all mask windows. The results are consistent with a Ga diffusion length on the silicon dioxide surface in the order of approximately 1 μm.

  14. 37 CFR 211.6 - Methods of affixation and placement of mask work notice.

    Science.gov (United States)

    2010-07-01

    ... placement of mask work notice. 211.6 Section 211.6 Patents, Trademarks, and Copyrights COPYRIGHT OFFICE, LIBRARY OF CONGRESS COPYRIGHT OFFICE AND PROCEDURES MASK WORK PROTECTION § 211.6 Methods of affixation and placement of mask work notice. (a) General. (1) This section specifies methods of affixation and...

  15. Computational mask defect review for contamination and haze inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram; Wolf, Yulian; Shah, Pinkesh

    2013-09-01

    As optical lithography continues to extend into sub-0.35 k1 regime, mask defect inspection and subsequent review has become tremendously challenging, and indeed the largest component to mask manufacturing cost. The routine use of various resolution enhancement techniques (RET) have resulted in complex mask patterns, which together with the need to detect even smaller defects due to higher MEEFs, now requires an inspection engineer to use combination of inspection modes. This is achieved in 193nm AeraTM mask inspection systems wherein masks are not only inspected at their scanner equivalent aerial exposure conditions, but also at higher Numerical Aperture resolution, and special reflected-light, and single-die contamination modes, providing better coverage over all available patterns, and defect types. Once the required defects are detected by the inspection system, comprehensively reviewing and dispositioning each defect then becomes the Achilles heel of the overall mask inspection process. Traditionally, defects have been reviewed manually by an operator, which makes the process error-prone especially given the low-contrast in the convoluted aerial images. Such manual review also limits the quality and quantity of classifications in terms of the different types of characterization and number of defects that can practically be reviewed by a person. In some ways, such manual classification limits the capability of the inspection tool itself from being setup to detect smaller defects since it often results in many more defects that need to be then manually reviewed. Paper 8681-109 at SPIE Advanced Lithography 2013 discussed an innovative approach to actinic mask defect review using computational technology, and focused on Die-to-Die transmitted aerial and high-resolution inspections. In this approach, every defect is characterized in two different ways, viz., quantitatively in terms of its print impact on wafer, and qualitatively in terms of its nature and origin in

  16. Taste-masked orodispersible tablets of cyclosporine self-nanoemulsion lyophilized with dry silica.

    Science.gov (United States)

    Zidan, Ahmed S; Aljaeid, Bader M; Mokhtar, Mahmoud; Shehata, Tamer M

    2015-01-01

    The aim of the current study was to investigate the effects of formulation parameters on the disintegration, water absorption and dissolution characteristics of cyclosporine A (CyA) loaded self-emulsifying drug delivery system (SEDDS) in an orodispersible compacts. Its taste masking efficiency was also attempted using an electronic tongue. ODTs were prepared by freeze-drying liquid SEDDS and synthetic amorphous silica suspension followed by direct compression. The influences of the compression forces and super-disintegrant were evaluated to optimize tablet characteristics. The liquid SEDDS was characterized by vesicular size of 48.5 nm, polydispersity index of 0.95, turbidity of 40.7 NTU and rapid CyA dissolution and emulsification rate. The results of micrometric studies demonstrated an acceptable flow, hardness and friability to indicate good mechanical strength of ODTs. The interaction and Pareto charts demonstrated a greater effect of low compression force to increase the porosity and facilitate the disintegration rather than the deformation action of the super-disintegrant. Super-disintegrant level was the most important factor affecting the dissolution parameter followed by the compression force then their interaction effect. Moreover, as indicated by Euclidean distance values and discrimination indices, the unpalatable taste and aversion taste of CyA to stimuli were masked in its optimized SEDDS incorporated ODTs. PMID:25069592

  17. Galaxies and their Masks A Conference in Honour of K.C. Freeman, FRS

    CERN Document Server

    Block, David L; Puerari, Ivânio

    2010-01-01

    Various kinds of masks obscure our view of our galaxy, the Milky Way, as well as of other galaxies. Masks of interstellar dust affect our measurements within galaxies, on scales ranging from individual supernovae to the galaxies themselves. The “mass mask” (our inability to image mass rather than light) gives astronomers a very incomplete picture of the size and structure of galaxies themselves, because we cannot image the dark matter which provides most of the galactic mass. Another mass is the “dynamical mask”: as galaxies form, much dynamical information is lost in the birthing process. A new thrust in research is to retrieve such information by means of chemical tagging. About 50 astronomers flew into Namibia in April 2010, to celebrate the 70th birthday of Professor K.C. Freeman, Fellow of the Royal Society. At age 70, Freeman, a father of dark matter in galaxies, continues to be one of planet’s most highly cited astronomers. The current volume affords readers a unique perspective on galaxies b...

  18. Masking of Wind Turbine Noise: Influence of wind turbulence on ambient noise fluctuations

    Energy Technology Data Exchange (ETDEWEB)

    Fegeant, Olivier

    2002-07-01

    In the issue of noise annoyance generated by wind turbines, masking by ambient noise is of great importance. At wind turbine sites, the main source of ambient noise arises from the wind blowing on the vegetation. However, natural wind can barely be described as a steady flow and 'lulls' and 'gusts' are words used to describe its unsteady component. This latter, also called wind turbulence, may affect the masking effect, as the wind turbine may become audible during short laps of time of low wind speed, that is of low ambient noise. The aim of the present report is to study the influence of wind turbulence on ambient noise fluctuations. It is shown that these latter are governed not only by the turbulence intensity, but also by its temporal and spatial structure. This report provides some elements of atmospheric turbulence as well as techniques for the simulation of turbulent wind fields. Simulation results are given that illustrate how the standard deviation of the vegetation noise can vary as function of the canopy size and turbulence spatial patterns. Finally, ambient noise fluctuations and their statistical descriptions are also discussed, based on both theoretical considerations and empirical results.

  19. Acoustic masking disrupts time-dependent mechanisms of memory encoding in word-list recall.

    Science.gov (United States)

    Cousins, Katheryn A Q; Dar, Hayim; Wingfield, Arthur; Miller, Paul

    2014-05-01

    Recall of recently heard words is affected by the clarity of presentation: Even if all words are presented with sufficient clarity for successful recognition, those that are more difficult to hear are less likely to be recalled. Such a result demonstrates that memory processing depends on more than whether a word is simply "recognized" versus "not recognized." More surprising is that, when a single item in a list of spoken words is acoustically masked, prior words that were heard with full clarity are also less likely to be recalled. To account for such a phenomenon, we developed the linking-by-active-maintenance model (LAMM). This computational model of perception and encoding predicts that these effects will be time dependent. Here we challenged our model by investigating whether and how the impact of acoustic masking on memory depends on presentation rate. We found that a slower presentation rate causes a more disruptive impact of stimulus degradation on prior, clearly heard words than does a fast rate. These results are unexpected according to prior theories of effortful listening, but we demonstrated that they can be accounted for by LAMM.

  20. Novel EUV mask black border suppressing EUV and DUV OoB light reflection

    Science.gov (United States)

    Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

    2016-05-01

    EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

  1. Processing of masked and unmasked emotional faces under different attentional conditions: an electrophysiological investigation.

    Directory of Open Access Journals (Sweden)

    Marzia eDel Zotto

    2015-10-01

    Full Text Available In order to investigate the interactions between non-spatial selective attention, awareness and emotion processing, we carried out an ERP study using a backward masking paradigm, in which angry, fearful, happy and neutral facial expressions were presented, while participants attempted to detect the presence of one or the other category of facial expressions in the different experimental blocks. ERP results showed that negative emotions enhanced an early N170 response over temporal-occipital leads in both masked and unmasked conditions, independently of selective attention. A later effect arising at the P2 was linked to awareness. Finally, selective attention was found to affect the N2 and N3 components over occipito-parietal leads. Our findings reveal that i the initial processing of facial expressions arises prior to attention and awareness; ii attention and awareness give rise to temporally distinct periods of activation independently of the type of emotion with only a partial degree of overlap; and iii selective attention appears to be influenced by the emotional nature of the stimuli, which in turn impinges on unconscious processing at a very early stage. This study confirms previous reports that negative facial expressions can be processed rapidly, in absence of visual awareness and independently of selective attention. On the other hand, attention and awareness may operate in a synergistic way, depending on task demand.

  2. Pattern generation requirements for mask making beyond 130 nm

    Science.gov (United States)

    Abboud, Frank E.; Gesley, Mark A.; Maldonado, Juan R.

    1998-06-01

    It is commonly accepted in the semiconductor industry that optical lithography will be the most cost-effective solution for 150 nm and 130 nm device generations. Some selected layers at the 130 nm device generation may be produced using electron-beam direct-write or x-ray during the development phase. However, for the production phase, it is expected that 193 nm optical lithography with reticle enhancement techniques such as optical proximity correction (OPC) and phase shift masks (PSM) will be the technology of choice. What about post 193 nm. The range of solutions is more diverse and a clear winner has not yet emerged. The topic, however, is becoming more visible and has taken a prominent place in technical conferences in the past year. The five leading potential alternatives to optical lithography are proximity x-ray, e-beam projection (EBP), extended UV (EUV), ion projection lithography (IPL), and e-beam direct write. The search for the right answer will most likely continue for a few years, and possibly more than one alternative will emerge as an effective solution at and below 100 nm. All of the alternatives, with the exception of e-beam direct write, have one thing in common, the mask. Except for proximity x- ray, all solutions at present envision a 4x reduction of the mask-to-wafer image plane. Instead of chrome-coated quartz, a silicon wafer substrate is used. Aside from patterning, mask fabrication varies depending on the lithography absorbing substrate, and EUV requires a reflective multilayer stack. Most key lithography requirements needed to pattern the imaging layer are common to all of the candidates, at least for the reduction methods. For x-ray lithography, the requirements are significantly more stringent but at a smaller field. This paper will consolidate the requirements of the various types of masks from a pattern generation point of view and will focus on the pattern generation tool requirements to meet those mask requirements. In addition, it

  3. Mask process matching using a model based data preparation solution

    Science.gov (United States)

    Dillon, Brian; Saib, Mohamed; Figueiro, Thiago; Petroni, Paolo; Progler, Chris; Schiavone, Patrick

    2015-10-01

    Process matching is the ability to precisely reproduce the signature of a given fabrication process while using a different one. A process signature is typically described as systematic CD variation driven by feature geometry as a function of feature size, local density or distance to neighboring structures. The interest of performing process matching is usually to address differences in the mask fabrication process without altering the signature of the mask, which is already validated by OPC models and already used in production. The need for such process matching typically arises from the expansion of the production capacity within the same or different mask fabrication facilities, from the introduction of new, perhaps more advanced, equipment to deliver same process of record masks and/or from the re-alignment of processes which have altered over time. For state-of-the-art logic and memory mask processes, such matching requirements can be well below 2nm and are expected to reduce below 1nm in near future. In this paper, a data preparation solution for process matching is presented and discussed. Instead of adapting the physical process itself, a calibrated model is used to modify the data to be exposed by the source process in order to induce the results to match the one obtained while running the target process. This strategy consists in using the differences among measurements from the source and target processes, in the calibration of a single differential model. In this approach, no information other than the metrology results is required from either process. Experimental results were obtained by matching two different processes at Photronics. The standard deviation between both processes was of 2.4nm. After applying the process matching technique, the average absolute difference between the processes was reduced to 1.0nm with a standard deviation of 1.3nm. The methods used to achieve the result will be described along with implementation considerations, to

  4. Micropulse Lidar Cloud Mask Value-Added Product Technical Report

    Energy Technology Data Exchange (ETDEWEB)

    Sivaraman, C; Comstock, J

    2011-07-25

    Lidar backscattered signal is a useful tool for identifying vertical cloud structure in the atmosphere in optically thin clouds. Cloud boundaries derived from lidar signals are a necessary input for popular ARM data products, such as the Active Remote Sensing of Clouds (ARSCL) product. An operational cloud boundary algorithm (Wang and Sassen 2001) has been implemented for use with the ARM Micropulse Lidar (MPL) systems. In addition to retrieving cloud boundaries above 500 m, the value-added product (VAP) named Micropulse Lidar Cloud Mask (MPLCMASK) applies lidar-specific corrections (i.e., range-square, background, deadtime, and overlap) as described in Campbell et al. (2002) to the measured backscattered lidar. Depolarization ratio is computed using the methodology developed by Flynn et al. (2007) for polarization-capable MPL systems. The cloud boundaries output from MPLCMASK will be the primary lidar cloud mask for input to the ARSCL product and will be applied to all MPL systems, including historical data sets.

  5. APPROACHES FOR TASTE MASKING USING STEVIA LEAF IN PHARAMCEUTICALS

    Directory of Open Access Journals (Sweden)

    Deepak Sharma

    2013-05-01

    Full Text Available Oral administration of pharmaceuticals is one of the most popular method of drug dilevery.Taste is an important factor in the development of dosage form. Many active Pharmaceutical ingredients are bitter and require some form of taste masking to yield palatable drug products. Proven methods for bitterness reduction and inhibition have resulted in improved palatability of oral pharmaceuticals. Several approaches like adding flavors and sweeteners, use of lipoproteins for inhibiting bitterness, coating of drug with inert agents, microencapsulation, multiple emulsion, viscosity modifiers, liposome, prodrug formation, salt formation, formation of inclusion and molecular complexes, solid dispersion system and application of ion exchange resins have been tried by the formulators to mask the unpleasant taste of the bitter drugs but these methods are highly cost effective. Stevia rebaudiana Bertoni, source of a high-potency natural sweetener and produces diterpene glycosides that are low calorie sweeteners, about 300 times sweeter than saccharose with addition inclusion of without interfere.

  6. Imaging protoplanets: observing transition disks with non-redundant masking

    CERN Document Server

    Sallum, Steph; Close, Laird M; Hinz, Philip M; Follette, Katherine B; Kratter, Kaitlin; Skemer, Andrew J; Bailey, Vanessa P; Briguglio, Runa; Defrere, Denis; Macintosh, Bruce A; Males, Jared R; Morzinski, Katie M; Puglisi, Alfio T; Rodigas, Timothy J; Spalding, Eckhart; Tuthill, Peter G; Vaz, Amali; Weinberger, Alycia; Xomperio, Marco

    2016-01-01

    Transition disks, protoplanetary disks with inner clearings, are promising objects in which to directly image forming planets. The high contrast imaging technique of non-redundant masking is well posed to detect planetary mass companions at several to tens of AU in nearby transition disks. We present non-redundant masking observations of the T Cha and LkCa 15 transition disks, both of which host posited sub-stellar mass companions. However, due to a loss of information intrinsic to the technique, observations of extended sources (e.g. scattered light from disks) can be misinterpreted as moving companions. We discuss tests to distinguish between these two scenarios, with applications to the T Cha and LkCa 15 observations. We argue that a static, forward-scattering disk can explain the T Cha data, while LkCa 15 is best explained by multiple orbiting companions.

  7. Technical validation of a face mask adapted for dry powder inhalation in the equine species.

    Science.gov (United States)

    Duvivier, D H; Votion, D; Vandenput, S; Art, T; Lekeux, P

    1997-11-01

    Development of dry powder inhalation (DPI) for horses requires the use of an adapted face mask. In experiment I, 4 masks (A, B, C and D) were tested and factors influencing the delivery of the dry powder were determined. Mask A was one which is commercially available for metered-dose inhalation. Mask B had the same shape as Mask A but an airtight rubber seal was added for the connection between the mask and horse's head. Mask C was a prototype adapted for DPI with connection for the DPI device between the nostrils, airtight expiratory valves in front of each nostril and airtight rubber seal to attach the mask on the horse's head. Mask D was the same as Mask C but the airtight expiratory valve was situated in front of one nostril and the connection for the DPI device was placed in front of the other nostril. Inhalet emptying and peak inspiratory pressure were measured on 5 healthy horses with each face mask. Both Masks A and B gave a low rate of inhalet emptying. Inspiratory pressures created in Masks C and D were negative enough to ensure inhalet emptying rates of mean +/- s.d. 98.28 +/- 1.79% and 100% respectively. In experiment 2, the face masks giving the greatest inhalet emptying were used to test the therapeutic efficacy of ipratropium bromide DPI. This was tested on 6 horses suffering from acute exacerbation of chronic obstructive pulmonary disease (COPD). At a dose of 200 micrograms/100 kg bwt, ipratropium administered with Mask D improved significantly pulmonary function measurements compared to baseline values and placebo inhalation. With Mask C, a double dose of ipratropium (400 micrograms/100 kg bwt) was necessary to improve these parameters compared to baseline values. This indicated the importance of locating the DPI device in front of one nostril. It was concluded that inhalet emptying is correlated to inspiratory pressures measured in the face masks. Secondly, these pressures are in turn dependent on the air-tightness of the mask, i.e. air

  8. New type X—ray mask fabricated using inductvely coupled plasma deepetching

    Institute of Scientific and Technical Information of China (English)

    D.Chen; W.Lei; S.Wang; C.Li; X.Guo; H.Mao; D.Zhang; F.Yi

    2001-01-01

    The fabrication of X-ray masks is a critical and challenging process in LIGA technique.As inductively coupled plasma(ICP) deepetching appears to be the most suitable source for deep silicon etching,we fabricated a new type X-ray mask using this technique.In comparison with other types of X-ray masks,the mask we fabricated has the advantages of its low cost and its simple fabrication process.Besired microstructures have also been fabricated using this new type X-ray mask in LIGA technique.

  9. Measurement of effectiveness of masking jamming against surveillance radar

    Science.gov (United States)

    Shen, Fengji; Shi, Zhaoxiang

    A method for making quantitative evaluations of the effectiveness of masking jamming (EMJ) is proposed which is based on the use of the JSR criterion defined by Boyd (1978). A practical implementation of the measurements based on the approach proposed here is described. The measurement of EMJ is implemented parallel to actual detection. By directly processing the radar output video signals, the system automatically gives EMJ readings in decibels versus SNR.

  10. APPROACHES FOR TASTE MASKING USING STEVIA LEAF IN PHARAMCEUTICALS

    OpenAIRE

    Deepak Sharma; Bhavesh Joshi; Rahul Kumar Garg; Ashok Dashora; deepak sahu; Piyush Agrawal; Piyush Mehta

    2013-01-01

    Oral administration of pharmaceuticals is one of the most popular method of drug dilevery.Taste is an important factor in the development of dosage form. Many active Pharmaceutical ingredients are bitter and require some form of taste masking to yield palatable drug products. Proven methods for bitterness reduction and inhibition have resulted in improved palatability of oral pharmaceuticals. Several approaches like adding flavors and sweeteners, use of lipoproteins for inhibiting bitterness,...

  11. TASTE MASKING AND FORMULATION OF ONDANSETRON HYDROCHLORIDE MOUTH DISSOLVING TABLETS

    OpenAIRE

    Shyam Raj Subedi, Bhupendra Kumar Poudel; Uttam Budhathoki, Panna Thapa

    2015-01-01

    This study was done to mask the bitter taste of ondansetron HCl using complexing agent, a polacrilex resin: Tulsion 335 and subsequently forming mouth dissolving tablet using superdisintegrants: Croscarmellose sodium and sodium starch glycollate. A preliminary screening was done. Batch process, a most preferential method for drug loading with ion exchange resins was selected. The process was optimized for drug: resin ratio to get maximum drug loading. A ratio of drug: resin at 1:3 was select...

  12. Compound Optical Film Using Gray Scale Mask Embedded with Microvoids

    OpenAIRE

    C. T. Pan; Chen, Y.C.; Y. J. Chen; Wang, W.C; Yang, H. C.; Wu, H C

    2012-01-01

    This study presents a compound optical film to improve luminance and uniformity to apply in side-LED (light-emitting diode) backlight module. LIGA (lithographie galvanoformung abformung) technology, soft lithography, and homemade gray scale mask were combined to fabricate microlens array. Optical film with variable size microlens array embedded with microvoids was designed and manufactured. FRED software was used to simulate optical performance. Microvoids were quantitatively embedded in the ...

  13. TASTE MASKING METHODS AND AGENTS IN PHARMACEUTICAL FORMULATIONS

    OpenAIRE

    Mirajkar Reshma Nilesh; Devkar Mangesh Shivaji; Kokare Dipali Rameshrao

    2012-01-01

    Taste is a critical factor during development of any dosage form and it is important parameter in administering drugs orally. Undesirable and particularly bitter taste is one of the important formulation problems that are encountered with many drugs. Proven methods for bitterness reduction and inhibition have resulted in improved palatability of oral pharmaceuticals. The present review explains in detail the various methods and agents used for taste-masking like, Inclusion complexation, Ion e...

  14. Developmental Effects in the Masking-Level Difference

    Science.gov (United States)

    Hall, Joseph W.; Buss, Emily; Grose, John H.; Dev, Madhu B.

    2004-01-01

    Adults and children (aged 5 years 1 month to 10 years 8 months) were tested in a masking-level difference (MLD) paradigm in which detection of brief signals was contrasted for signal placement in masker envelope maxima versus masker envelope minima. Maskers were 50-Hz-wide noise bands centered on 500 Hz, and the signals were So or S[pi] 30-ms,…

  15. Comparison of Three Methods in Improving Bag Mask Ventilation

    OpenAIRE

    Samad EJ Golzari; Hassan Soleimanpour; Hamidreza Mehryar; Shaker Salarilak; Ata Mahmoodpoor; Jafar Rahimi Panahi; Mohammadreza Afhami; Majid Sabahi; Zahra Hassani

    2014-01-01

    Introduction: Increasedlife expectancy in populations has brought along specific new scenarios in the fields of medicine for the elderly; prevalence of physical complications such as edentulism and patients with dentures is growing. Management of anesthesia and ventilation in this group of patients has turned into a great challenge. Some researchers suggest dentures to be left in place during bag-mask ventilation; yet, no unanimous agreement exists in this regard. Methods: In a single bli...

  16. Removing the Mask: Revealing Imperfection through Authentic Leadership

    OpenAIRE

    Fiala, Elizabeth Ann

    2016-01-01

    I have always strived to be perceived as the perfect stage manager. To me, perfection means never making a mistake or appearing vulnerable. Trying to achieve this perfection has meant avoiding moments when I could appear weak, or even worse, risk the possibility of failure. As a result, my attempt toward perfectionism created boundaries that kept me safe, but also kept me from authentically connecting with my collaborators. In The Venetian Twins, the citizens of Verona wear masks to tell the...

  17. DEVELOPMENT AND EVALUATION OF TASTE MASKED ORODISPERSIBLE TABLET OF OFLOXACIN

    Directory of Open Access Journals (Sweden)

    S.P. Dhamane*, M.P. Wagh , G.P. Asnani , A. S. Kulkarni , B. S. Patil and A.S. Gadekar

    2013-03-01

    Full Text Available ABSTRACT: Ofloxacin is an antibacterial agent used to treat infections. It is extremely bitter in taste and taste should be masked to formulate it in a palatable form. The purpose of present research work was to formulate tasteless complexes of ofloxacin with indion 204 ion exchange resin. The drug loading onto ion-exchange resin was optimized for mixing time, activation, effect of pH, mode of mixing, ratio of drug: resin and temperature. The resinate was evaluated for taste masking and in vitro drug release. DSC analysis study supported complex formation. ofloxacin- indion 204 complex of ratio 1:1.5 was developed into orodispersible tablet using different superdisintegrants with varying concentration and was evaluated for weight variation, hardness, friability, wetting time, water absorption ratio, content uniformity, disintegration time and dissolution and was found superior over conventional formulation. The F5 batch with disintegration time 19.33 Sec ±3.78 and dissolution within 45 minutes 89.642±2.20 was selected as optimized formulation. By an appropriate selection and combination of excipients, it was possible to obtain orodispersible and taste masked tablets. Batch F5 Contains, Ofloxacin: Indion-204 complex (1:1.5 Ratio, Sodium starch Glycolate, Crosspovidone, Crosscarmellose sodium, NaHCO3, Citric acid, Mannitol, Talc.

  18. Review of literature on the endangered masked bobwhite

    Science.gov (United States)

    Tomlinson, R.E.

    1972-01-01

    The masked bobwhite (Colinus virginianus ridgwayi) once inhabited restricted areas in southern Arizona and middle Sonora, Mexico. It probably never was a widespread and abundant bird. Ornithologists discovered this race in 1884, presumably during its final decline in Arizona due to overgrazing and a series of droughts. . It was gone from Arizona by 1900. Apparently the bird was not seriously threatened in Sonora until the 1940's when the cattle industry increased there. Only small and scattered populations remain in Sonora today. Although behavior of the masked bobwhite is similar to that of the closely-related eastern bobwhite (C. v. virginianus), the desert variety prefers a mesquite-grassland habitat at elevations of from 1,000 to 4,000 feet, has a later and shorter nesting season, and has more striking sexual plumage. The male's black head and 'robin's red' breast readily identify the bird. Average annual precipitation in the heart of its Sonoran habitat is 13.5 inches, with 75 percent of that occurring during the 3-month period of July through September. Foods consist of small weed and grass seeds, supplemented with invertebrates and green vegetational growth during the summer rainy season. Early attempts at reintroduction of masked bobwhites into Arizona failed. Experiments on propagation and reestablishment and a life history study are currently being carried out by the Bureau of Sport Fisheries and Wildlife in cooperation with the Arizona Fish and Game Department.

  19. Coronagraphy with 4Q Phase Mask on the VLT

    Science.gov (United States)

    Rouan, Daniel; Riaud, Pierre; Baudrand, Jacques; Lacombe, François

    The high angular resolution provided by adaptive optics allows detailed study of the environment of bright objects such as stars or AGNs, provided that dazzling by the direct and scattered light from the central source does not become the main limitation. Masking the bright source with a coronagraph is the way to alleviate this problem. Rabbia and Gay (this conference) propose a possible solution. We recently described another concept of faint object coronagraph using a phase mask with 4 quadrants, which presents an excellent rejection factor, and that can be rather easily made achromatic. We propose to install such a device within the NAOS/CONICA instrument. We first examine the properties of this device in terms of rejection gain versus the different factors (residual AO phase error, central obscuration, chromatism). We estimate the performances under different conditions of adaptive optics correction with NAOS/CONICA and of phase errors due to chromatism within the K band. Results of realistic simulations at K show that a gain of 10-12 magnitude is reachable. We finally describe some technical aspects of the mask manufacturing and achromatisation using two dispersive materials, as well as the implementation of the 4QC within CONICA.

  20. Sparse aperture mask for low order wavefront sensing

    Science.gov (United States)

    Subedi, Hari; Zimmerman, Neil T.; Kasdin, N. Jeremy; Cavanagh, Kathleen; Riggs, A. J. E.

    2015-09-01

    A high contrast is required for direct imaging of exoplanets. Ideally, the level of contrast required for direct imaging of exoplanets can be achieved by coronagraphic imaging, but in practice, the contrast is degraded by wavefront aberrations. To achieve the required contrast, low-order wavefront aberrations such as tip-tilt, defocus and coma must be determined and corrected. In this paper, we present a technique that integrates a sparse- aperture mask (SAM) with a shaped pupil coronagraph (SPC) to make precise estimates of these low-order aberrations. Starlight rejected by the coronagraph's focal plane stop is collimated to a relay pupil, where the mask forms an interference fringe pattern on a detector. Using numerical simulations, we show that the SAM can estimate rapidly varying tip-tilt errors in space telescopes arising from line-of-sight pointing oscillations as well as other higher-order modes. We also show that a Kalman filter can be used with the SAM to improve the estimation. At Princetons High Contrast Imaging Laboratory, we have recently created a testbed devoted to low-order wavefront sensing experiments. The testbed incorporates custom-fabricated masks (shaped pupil, focal plane, and sparse aperture) with a deformable mirror and a CCD camera to demonstrate the estimation and correction of low-order aberrations. Our first experiments aim to replicate the results of the SAM wavefront sensor (SAM WFS) Fourier propagation models.

  1. Super-Resolution Recording by an Organic Photochromic Mask Layer

    Institute of Scientific and Technical Information of China (English)

    SHI Ming; ZHAO Sheng-Min; YI Jia-Xiang; ZHAO Fu-Qun; NIU Li-Hong; LI Zhong-Yu; ZHANG Fu-Shi

    2007-01-01

    By using the super-resolution near-field structure(super-RENS)method,the super-resolution recording marks are obtained practically by an organic photochromic diarylethene mask layer,under much lower recording laser Dower of 0.45mW.The size of recording marks is decreased by 60% (from 1.6μm to 0.7μm) for a diarylethene (photo-mode)recording layer by the optical detection method(limited by optical diffraction),or decreased by 97%(from 1600nm to 50nm)for a heptaoxyl copper phthalocyanine(thermo-optical)recording layer,the latter is much smaller than the limitation of optical diffraction.In order to obtain a desirable result,a proper extent or Dhotochemistry reaction in the mask layer is needed.Thus,the super-resolution recording marks can be obtained by adjusting the concentration of diarylethene in the mask layer,the recording laser power,and the moving speed of the sample disc.

  2. Optimized distributed computing environment for mask data preparation

    Science.gov (United States)

    Ahn, Byoung-Sup; Bang, Ju-Mi; Ji, Min-Kyu; Kang, Sun; Jang, Sung-Hoon; Choi, Yo-Han; Ki, Won-Tai; Choi, Seong-Woon; Han, Woo-Sung

    2005-11-01

    As the critical dimension (CD) becomes smaller, various resolution enhancement techniques (RET) are widely adopted. In developing sub-100nm devices, the complexity of optical proximity correction (OPC) is severely increased and applied OPC layers are expanded to non-critical layers. The transformation of designed pattern data by OPC operation causes complexity, which cause runtime overheads to following steps such as mask data preparation (MDP), and collapse of existing design hierarchy. Therefore, many mask shops exploit the distributed computing method in order to reduce the runtime of mask data preparation rather than exploit the design hierarchy. Distributed computing uses a cluster of computers that are connected to local network system. However, there are two things to limit the benefit of the distributing computing method in MDP. First, every sequential MDP job, which uses maximum number of available CPUs, is not efficient compared to parallel MDP job execution due to the input data characteristics. Second, the runtime enhancement over input cost is not sufficient enough since the scalability of fracturing tools is limited. In this paper, we will discuss optimum load balancing environment that is useful in increasing the uptime of distributed computing system by assigning appropriate number of CPUs for each input design data. We will also describe the distributed processing (DP) parameter optimization to obtain maximum throughput in MDP job processing.

  3. Professional and home-made face masks reduce exposure to respiratory infections among the general population.

    Directory of Open Access Journals (Sweden)

    Marianne van der Sande

    Full Text Available BACKGROUND: Governments are preparing for a potential influenza pandemic. Therefore they need data to assess the possible impact of interventions. Face-masks worn by the general population could be an accessible and affordable intervention, if effective when worn under routine circumstances. METHODOLOGY: We assessed transmission reduction potential provided by personal respirators, surgical masks and home-made masks when worn during a variety of activities by healthy volunteers and a simulated patient. PRINCIPAL FINDINGS: All types of masks reduced aerosol exposure, relatively stable over time, unaffected by duration of wear or type of activity, but with a high degree of individual variation. Personal respirators were more efficient than surgical masks, which were more efficient than home-made masks. Regardless of mask type, children were less well protected. Outward protection (mask wearing by a mechanical head was less effective than inward protection (mask wearing by healthy volunteers. CONCLUSIONS/SIGNIFICANCE: Any type of general mask use is likely to decrease viral exposure and infection risk on a population level, in spite of imperfect fit and imperfect adherence, personal respirators providing most protection. Masks worn by patients may not offer as great a degree of protection against aerosol transmission.

  4. Imaging 100 nm contacts with high transmission attenuated phase shift masks

    Science.gov (United States)

    Beach, James V.; Petersen, John S.; Eynon, Benjamin G., Jr.; Taylor, Darren; Gerold, Dave J.; Maslow, Mark J.

    2002-12-01

    This study explores the capability of printing 100 nm contacts through the use of 9% and 15% attenuated phase shift masks and a 0.75 NA 193 nm scanner. The mask designs targeted simultaneous solutions for 100 nm contacts at pitches from 200 nm to 300 nm. The two masks were successfully manufactured from experimental MoSiON embedded-attenuated phase shift mask (EAPSM) blanks. The 100 nm contacts were successfully printed with a depth of focus (DOF) from 0.1-0.7 μm. Overlapping process windows were not achieved but were possible upon adjustment of the mask biases. The observed mask error enhancement factor (MEEF) was approximately 3 for the 220 nm pitch. Side lobe printing was not observed for either mask.

  5. Oxygen-Partial-Pressure Sensor for Aircraft Oxygen Mask

    Science.gov (United States)

    Kelly, Mark; Pettit, Donald

    2003-01-01

    A device that generates an alarm when the partial pressure of oxygen decreases to less than a preset level has been developed to help prevent hypoxia in a pilot or other crewmember of a military or other high-performance aircraft. Loss of oxygen partial pressure can be caused by poor fit of the mask or failure of a hose or other component of an oxygen distribution system. The deleterious physical and mental effects of hypoxia cause the loss of a military aircraft and crew every few years. The device is installed in the crewmember s oxygen mask and is powered via communication wiring already present in all such oxygen masks. The device (see figure) includes an electrochemical sensor, the output potential of which is proportional to the partial pressure of oxygen. The output of the sensor is amplified and fed to the input of a comparator circuit. A reference potential that corresponds to the amplified sensor output at the alarm oxygen-partial-pressure level is fed to the second input of the comparator. When the sensed partial pressure of oxygen falls below the minimum acceptable level, the output of the comparator goes from the low state (a few millivolts) to the high state (near the supply potential, which is typically 6.8 V for microphone power). The switching of the comparator output to the high state triggers a tactile alarm in the form of a vibration in the mask, generated by a small 1.3-Vdc pager motor spinning an eccentric mass at a rate between 8,000 and 10,000 rpm. The sensation of the mask vibrating against the crewmember s nose is very effective at alerting the crewmember, who may already be groggy from hypoxia and is immersed in an environment that is saturated with visual cues and sounds. Indeed, the sensation is one of rudeness, but such rudeness could be what is needed to stimulate the crewmember to take corrective action in a life-threatening situation.

  6. Optimized qualification protocol on particle cleanliness for EUV mask infrastructure

    Science.gov (United States)

    van der Donck, J. C. J.; Stortelder, J. K.; Derksen, G. B.

    2011-11-01

    With the market introduction of the NXE:3100, Extreme Ultra Violet Lithography (EUVL) enters a new stage. Now infrastructure in the wafer fabs must be prepared for new processes and new materials. Especially the infrastructure for masks poses a challenge. Because of the absence of a pellicle reticle front sides are exceptionally vulnerable to particles. It was also shown that particles on the backside of a reticle may cause tool down time. These effects set extreme requirements to the cleanliness level of the fab infrastructure for EUV masks. The cost of EUV masks justifies the use of equipment that is qualified on particle cleanliness. Until now equipment qualification on particle cleanliness have not been carried out with statistically based qualification procedures. Since we are dealing with extreme clean equipment the number of observed particles is expected to be very low. These particle levels can only be measured by repetitively cycling a mask substrate in the equipment. Recent work in the EUV AD-tool presents data on added particles during load/unload cycles, reported as number of Particles per Reticle Pass (PRP). In the interpretation of the data, variation by deposition statistics is not taken into account. In measurements with low numbers of added particles the standard deviation in PRP number can be large. An additional issue is that particles which are added in the routing outside the equipment may have a large impact on the testing result. The number mismatch between a single handling step outside the tool and the multiple cycling in the equipment makes accuracy of measurements rather complex. The low number of expected particles, the large variation in results and the combined effect of added particles inside and outside the equipment justifies putting good effort in making a test plan. Without a proper statistical background, tests may not be suitable for proving that equipment qualifies for the limiting cleanliness levels. Other risks are that a

  7. [Airway equipment and its maintenance for a non difficult adult airway management (endotracheal intubation and its alternative: face mask, laryngeal mask airway, laryngeal tube)].

    Science.gov (United States)

    Francon, D; Estèbe, J P; Ecoffey, C

    2003-08-01

    The airway equipment for a non difficult adult airway management are described: endotracheal tubes with a specific discussion on how to inflate the balloon, laryngoscopes and blades, stylets and intubation guides, oral airways, face masks, laryngeal mask airways and laryngeal tubes. Cleaning and disinfections with the maintenance are also discussed for each type of airway management. PMID:12943860

  8. Beyond a Mask and Against the Bottleneck: Retroactive Dual-Task Interference During Working Memory Consolidation of a Masked Visual Target

    NARCIS (Netherlands)

    Nieuwenstein, Mark; Wyble, Brad

    2014-01-01

    While studies on visual memory commonly assume that the consolidation of a visual stimulus into working memory is interrupted by a trailing mask, studies on dual-task interference suggest that the consolidation of a stimulus can continue for several hundred milliseconds after a mask. As a result, es

  9. Spatial masking: Development and testing of a new tinnitus assistive technology.

    Science.gov (United States)

    Searchfield, Grant D; Kobayashi, Kei; Hodgson, Shirley-Anne; Hodgson, Catherine; Tevoitdale, Hannah; Irving, Sam

    2016-01-01

    Masking is widely used in the management of tinnitus, however, masking at the perceived spatial location of tinnitus has not been investigated. This article examines the development of a method for the spatial masking of tinnitus. This report consists of three studies: Study I is a proof of concept study comparing customized spatial masking to conventional bilateral masking; Study II is a prototype evaluation in which the spatial masking paradigm was compared to a bilaterally equal masker using iPods connected to hearing aids in a 4-week cross-over trial; and Study III is a 4-month crossover pilot study-using prototype hearing aid-based maskers, and in which three-dimensional (3D) masking (2 months) was compared to a Tinnitus Retraining Therapy (2 months). There was a preference for the 3D masking stimulus across all three studies. Individual changes in the Tinnitus Handicap Inventory (THI) after 2 weeks of trial (Study II) and Tinnitus Functional Index (TFI) after 2 months of trial (Study III) were observed without large group differences. The spatial masking concept was piloted successfully. The qualitative and quantitative results obtained indicate directions for future clinical trials and therapy development. This study indicates that spatial masking of tinnitus is feasible, of benefit to many participants, and warrants further trials. PMID:26817495

  10. SU-8 negative photoresist for optical mask manufacturing

    Science.gov (United States)

    Bogdanov, Alexei L.

    2000-06-01

    The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive e-beam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching. However, difficult CD control due to the acid catalyzer diffusion and quite narrow post exposure bake (PEB) process window are some of the major drawbacks of these resists. SU-8 is recently introduced to the market negative photoresist. High sensitivity, fairly good adhesion properties, and relatively simple processing of SU-8 make it a good substitution for novolac based chemically amplified negative e-beam resists in optical mask manufacturing. The replacement of traditional chemically amplified resists by SU- 8 can increase the process latitude and reduce resist costs. Among the obvious drawbacks of SU-8 are the use of solvent- based developer and demand of oxygen plasma for resist removal. In this paper the use of SU-8 for optical mask manufacturing is reported. All steps of resist film preparation, exposure and development are paid a share of attention. Possibilities to use reactive ion etching (RIE) with oxygen in order to increase resist mask contrast are discussed. Special exposure strategy (pattern outlining) was employed to further improve the edge definition. The resist PEB temperature and time were studied to estimate their weight in overall CD control performance. Specially designed test patterns with 0.25 micrometer design rule could be firmly transferred into a chromium layer both by wet etching and ion milling. Influence of exposure dose variation on the pattern CD change was studied.

  11. Polymer masks for structured surface and plasma etching

    Energy Technology Data Exchange (ETDEWEB)

    Vital, Alexane [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Groupe de Recherches sur l’Énergétique des Milieux Ionisés (GREMI), Polytech’Orléans, 14 rue d’Issoudun, B.P. 6744, F45067 Orléans Cedex 2 (France); Vayer, Marylène, E-mail: marylene.vayer@univ-orleans.fr [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Sinturel, Christophe [Centre de Recherche sur la Matière Divisée (CRMD), 1b rue de la Férollerie, F45071 Orléans Cedex (France); Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Rémi [Groupe de Recherches sur l’Énergétique des Milieux Ionisés (GREMI), Polytech’Orléans, 14 rue d’Issoudun, B.P. 6744, F45067 Orléans Cedex 2 (France)

    2015-03-30

    Graphical abstract: - Highlights: • Sub-micrometric silicon structures were prepared by cryogenic plasma etching. • Polymer templates based on phase-separated films of PS/PLA were used. • Silica structured masks were prepared by filling the polymer templates. • Etching of underlying silicon through silica templates gave original structures. - Abstract: Silica and silicon structures have been prepared at the sub-micrometer length-scale, using laterally phase-separated thin films of poly(styrene) (PS) and poly(lactic acid) (PLA) homopolymer blends. The selective removal of one polymer and the filling of the released space by silica precursor solution led, after calcination, to silica structures on silicon such as arrays of bowl-shape features or pillars, layers with through or non-through cylindrical holes, which has not been observed for some of them. The control of the morphology of the initial polymer film was a key point to achieve such type of structures. Particularly relevant was the use of solvent vapor annealing (vs thermal annealing) of the initial spin-coated films that favored and stabilized laterally phase-separated morphologies. Characteristic dimension of the domains were shown to be coupled with the thickness of the film, thinner films giving smaller domain sizes. Despite a relatively high incompatibility of the two polymers, a macro-phase separation was prevented in all the studied conditions. Sub-micrometric domains were formed, and for the thinner films, nanometric domains as small as 74 nm in size can be obtained. The silica structures formed by the infiltration of the polymer templates were used as hard masks for the cryogenic etching of underlying silicon. New structured surfaces, arrays of silicon pillars which can be plain or hollow at the upper part or arrays of cylindrical holes were formed. A selectivity as high as 21 was obtained using this type of mask for 1.5 μm deep holes having a typical diameter of 200 nm.

  12. On numerical reconstructions of lithographic masks in DUV scatterometry

    Science.gov (United States)

    Henn, M.-A.; Model, R.; Bär, M.; Wurm, M.; Bodermann, B.; Rathsfeld, A.; Gross, H.

    2009-06-01

    The solution of the inverse problem in scatterometry employing deep ultraviolet light (DUV) is discussed, i.e. we consider the determination of periodic surface structures from light diffraction patterns. With decreasing dimensions of the structures on photo lithography masks and wafers, increasing demands on the required metrology techniques arise. Scatterometry as a non-imaging indirect optical method is applied to periodic line structures in order to determine the sidewall angles, heights, and critical dimensions (CD), i.e., the top and bottom widths. The latter quantities are typically in the range of tens of nanometers. All these angles, heights, and CDs are the fundamental figures in order to evaluate the quality of the manufacturing process. To measure those quantities a DUV scatterometer is used, which typically operates at a wavelength of 193 nm. The diffraction of light by periodic 2D structures can be simulated using the finite element method for the Helmholtz equation. The corresponding inverse problem seeks to reconstruct the grating geometry from measured diffraction patterns. Fixing the class of gratings and the set of measurements, this inverse problem reduces to a finite dimensional nonlinear operator equation. Reformulating the problem as an optimization problem, a vast number of numerical schemes can be applied. Our tool is a sequential quadratic programing (SQP) variant of the Gauss-Newton iteration. In a first step, in which we use a simulated data set, we investigate how accurate the geometrical parameters of an EUV mask can be reconstructed, using light in the DUV range. We then determine the expected uncertainties of geometric parameters by reconstructing from simulated input data perturbed by noise representing the estimated uncertainties of input data. In the last step, we use the measurement data obtained from the new DUV scatterometer at PTB to determine the geometrical parameters of a typical EUV mask with our reconstruction algorithm

  13. Hierarchical e-beam proximity correction in mask making

    Science.gov (United States)

    Hofmann, Ulrich; Kalus, Christian K.; Rosenbusch, Anja; Jonckheere, Rik M.; Hourd, Andrew C.

    1996-05-01

    Both e-beam and optical proximity effects are still a major barrier in the transfer of an ULSI design from the CAD station to the printed result on wafer. Optical proximity effect correction (OPC) is shown to be a strong tool to improve the printing latitudes for i-line lithography of 0.35 micrometers feature sizes and below, but leads to fractal geometries around 0.1 micrometers (corresponding to 0.5 micrometers on a 5x reticle). This quantum leap in required minimum linewidth on the mask may urge mask makers to apply e-beam proximity effect correction (PEC), even more than a decrease in the reticle magnification from 5x to 4x (and further) would. For raster scan e-beams, which are typically used in mask making, correction by dose variation is not practical. Hence, PEC for these systems must be tackled by modifying the geometry of the design, in a way similar to OPC techniques. Both corrections must compromise between the accuracy achieved, which is dominated by the selected (correction and exposure) grid size, and the resulting throughput loss, caused by the use of a smaller grid size. Sigma-C now introduces a new algorithm, which enables the proximity effect correction by shape variation. It is included into CAPROX and supports hierarchy in the same manner as the other postprocessing operations. The exposure of the shape corrected pattern on a raster scan machine requires only one beam pass, whereas dose variation would require one pass for each dose. Exposures were made at IMEC and at Compugraphics. The first results on Leica EBMF10.5 and MEBES III are promising. The pure shape correction increases the line width uniformity and opens the process window for critical dimensions below 1 micrometers . Performance measurements show that the 64 Mb DRAM is a job of a few hours.

  14. Study of shape evaluation for mask and silicon using large field of view

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Shinoda, Shinichi; Toyoda, Yasutaka

    2010-09-01

    We have developed a highly integrated method of mask and silicon metrology. The aim of this integration is evaluating the performance of the silicon corresponding to Hotspot on a mask. It can use the mask shape of a large field, besides. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. Currently, as semiconductor manufacture moves towards even smaller feature size, this necessitates more aggressive optical proximity correction (OPC) to drive the super-resolution technology (RET). In other words, there is a trade-off between highly precise RET and mask manufacture, and this has a big impact on the semiconductor market that centers on the mask business. As an optimal solution to these issues, we provide a DFM solution that extracts 2-dimensional data for a more realistic and error-free simulation by reproducing accurately the contour of the actual mask, in addition to the simulation results from the mask data. On the other hand, there is roughness in the silicon form made from a mass-production line. Moreover, there is variation in the silicon form. For this reason, quantification of silicon form is important, in order to estimate the performance of a pattern. In order to quantify, the same form is equalized in two dimensions. And the method of evaluating based on the form is popular. In this study, we conducted experiments for averaging method of the pattern (Measurement Based Contouring) as two-dimensional mask and silicon evaluation technique. That is, observation of the identical position of a mask and a silicon was considered. The result proved its detection accuracy and reliability of variability on two-dimensional pattern (mask and silicon) and is adaptable to following fields of mask quality management. •Discrimination of nuisance defects for fine pattern. •Determination of two-dimensional variability of

  15. The Four-Quadrant Phase-Mask Coronagraph. I. Principle

    Science.gov (United States)

    Rouan, D.; Riaud, P.; Boccaletti, A.; Clénet, Y.; Labeyrie, A.

    2000-11-01

    We describe a new type of coronagraph, based on the principle of a phase mask as proposed by Roddier and Roddier a few years ago but using an original mask design found by one of us (D. R.), a four-quadrant binary phase mask (0, π) covering the full field of view at the focal plane. The mutually destructive interferences of the coherent light from the main source produce a very efficient nulling. The computed rejection rate of this coronagraph appears to be very high since, when perfectly aligned and phase-error free, it could in principle reduce the total amount of light from the bright source by a factor of 108, corresponding to a gain of 20 mag in brightness at the location of the first Airy ring, relative to the Airy peak. In the real world the gain is of course reduced by a strong factor, but nulling is still performing quite well, provided that the perturbation of the phase, for instance, due to the Earth's atmosphere, is efficiently corrected by adaptive optics. We show from simulations that a detection at a contrast of 10 mag between a star and a faint companion is achievable in excellent conditions, while 8 mag appears routinely feasible. This coronagraph appears less sensitive to atmospheric turbulence and has a larger dynamic range than other recently proposed nulling techniques: the phase-mask coronagraph (by Roddier and Roddier) or the Achromatic Interfero-Coronagraph (by Gay and Rabbia). We present the principle of the four-quadrant coronagraph and results of a first series of simulations. We compare those results with theoretical performances of other devices. We briefly analyze the different limitations in space or ground-based observations, as well as the issue of manufacturing the device. We also discuss several ways to improve the detection of a faint companion around a bright object. We conclude that, with respect to previous techniques, an instrument equipped with this coronagraph should have better performance and even enable the imaging of

  16. Musical Sound Separation Based on Binary Time-Frequency Masking

    Directory of Open Access Journals (Sweden)

    Wang DeLiang

    2009-01-01

    Full Text Available The problem of overlapping harmonics is particularly acute in musical sound separation and has not been addressed adequately. We propose a monaural system based on binary time-frequency masking with an emphasis on robust decisions in time-frequency regions, where harmonics from different sources overlap. Our computational auditory scene analysis system exploits the observation that sounds from the same source tend to have similar spectral envelopes. Quantitative results show that utilizing spectral similarity helps binary decision making in overlapped time-frequency regions and significantly improves separation performance.

  17. Analysis by Neutron activation of the Calakmul jadeite mask

    International Nuclear Information System (INIS)

    It is very important to know the elemental composition of archaeological materials with the purpose to find relations that allow to establish their origin standards. the origin and present localization of pre hispanic archaeological pieces can lead to the determination of commercial routes and of technology transfer among different ancient cultures. In the present work it has been realized a systematic analysis using the Instrumental neutron activation analysis technique of three samples obtained from Calakmul jadeite mask, tomb I, that in addition to give a composition of constituent and trace elements detected by this technique it has leaded to establish an applicable methodology to the routine analysis of ceramics of historical interest. (Author)

  18. Noise masking reveals channels for second-order letters

    OpenAIRE

    Oruç, İpek; Landy, Michael S.; Pelli, Denis G.

    2005-01-01

    We investigate the channels underlying identification of second-order letters using a critical-band masking paradigm. We find that observers use a single 1–1.5 octave-wide channel for this task. This channel’s best spatial frequency (c/letter) did not change across different noise conditions (indicating the inability of observers to switch channels to improve signal-to-noise ratio) or across different letter sizes (indicating scale invariance), for a fixed carrier frequency (c/letter). Howeve...

  19. Vector wave diffraction pattern of slits masked by polarizing devices

    Indian Academy of Sciences (India)

    Mohammad Tahir; K Bhattacharya; A K Chakraborty

    2012-03-01

    Polarization property is important to the optical imaging system. It has recently been understood that the polarization properties of light can be fruitfully used for improving the characteristics of imaging system that includes polarizing devices. The vector wave imagery lends an additional degree of freedom that can be utilized for obtaining results that are unobtainable in scalar wave imagery. This calls for a systematic study of diffraction properties of different apertures using polarization-sensitive devices. In the present paper, we have studied the Fraunhofer diffraction pattern of slits masked by different kinds of polarizing devices which introduce a phase difference between the two orthogonal components of the incident beam.

  20. The Investigation on Mask and Plasticine Laser Shock Forming

    OpenAIRE

    Li Liyin; Wang Xiao; Shen Zongbao; Liu Huixia; Ma Youjuan

    2016-01-01

    A novel technology called mask and plasticine laser shock forming (MAPLSF) was introduced to manufacture micro-features on the surface of pure copper foil with the thickness of 40μm. In this process, the laser-generated shock wave and plasticine are used to replace the conventional rigid punch and die. The result showed that the shape of laser beam can be roughly manufactured on the surface of the workpiece and this mold-free laser shock forming process is a fast method to fabricate controlle...

  1. A mask quality control tool for the OSIRIS multi-object spectrograph

    Science.gov (United States)

    López-Ruiz, J. C.; Vaz Cedillo, Jacinto Javier; Ederoclite, Alessandro; Bongiovanni, Ángel; González Escalera, Víctor

    2012-09-01

    OSIRIS multi object spectrograph uses a set of user-customised-masks, which are manufactured on-demand. The manufacturing process consists of drilling the specified slits on the mask with the required accuracy. Ensuring that slits are on the right place when observing is of vital importance. We present a tool for checking the quality of the process of manufacturing the masks which is based on analyzing the instrument images obtained with the manufactured masks on place. The tool extracts the slit information from these images, relates specifications with the extracted slit information, and finally communicates to the operator if the manufactured mask fulfills the expectations of the mask designer. The proposed tool has been built using scripting languages and using standard libraries such as opencv, pyraf and scipy. The software architecture, advantages and limits of this tool in the lifecycle of a multiobject acquisition are presented.

  2. Mask Iterative Hard Thresholding Algorithms for Sparse Image Reconstruction of Objects with Known Contour

    CERN Document Server

    Dogandzic, Aleksandar; Qiu, Kun

    2011-01-01

    We develop mask iterative hard thresholding algorithms (mask IHT and mask DORE) for sparse image reconstruction of objects with known contour. The measurements follow a noisy underdetermined linear model common in the compressive sampling literature. Assuming that the contour of the object that we wish to reconstruct is known and that the signal outside the contour is zero, we formulate a constrained residual squared error minimization problem that incorporates both the geometric information (i.e. the knowledge of the object's contour) and the signal sparsity constraint. We first introduce a mask IHT method that aims at solving this minimization problem and guarantees monotonically non-increasing residual squared error for a given signal sparsity level. We then propose a double overrelaxation scheme for accelerating the convergence of the mask IHT algorithm. We also apply convex mask reconstruction approaches that employ a convex relaxation of the signal sparsity constraint. In X-ray computed tomography (CT),...

  3. Estimating individual listeners’ auditory-filter bandwidth in simultaneous and non-simultaneous masking

    DEFF Research Database (Denmark)

    Buchholz, Jörg; Caminade, Sabine; Strelcyk, Olaf;

    2010-01-01

    Frequency selectivity in the human auditory system is often measured using simultaneous masking of tones presented in notched noise. Based on such masking data, the equivalent rectangular bandwidth (ERB) of the auditory filters can be derived by applying the power spectrum model of masking...... and assuming a rounded-exponential filter shape. If a forward masking paradigm is used instead of simultaneous masking, filter estimates typically show significantly sharper tuning. This difference in frequency selectivity has commonly been related to spectral suppression mechanisms observed in the cochlea...... the reliability of the individual estimates, a statistical resampling method is applied. It is demonstrated that a rather large set of experimental data is required to reliably estimate auditory filter bandwidth, particularly in the case of simultaneous masking. The poor overall reliability of the filter...

  4. Multiple beam mask writers: an industry solution to the write time crisis

    Science.gov (United States)

    Litt, Lloyd C.

    2010-09-01

    The semiconductor industry is under constant pressure to reduce production costs even as technology complexity increases. Lithography represents the most expensive process due to its high capital equipment costs and the implementation of low-k1 lithographic processes, which has added to the complexity of making masks through the greater use of optical proximity correction, pixelated masks, and double or triple patterning. Each of these mask technologies allows the production of semiconductors at future nodes while extending the utility of current immersion tools. Low k1 patterning complexity combined with increased data due to smaller feature sizes is driving extremely long mask write times. While a majority of the industry is willing to accept mask write times of up to 24 hours, evidence suggests that the write times for many masks at the 22 nm node and beyond will be significantly longer. It has been estimated that $50M+ in non-recurring engineering (NRE) costs will be required to develop a multiple beam mask writer system, yet the business case to recover this kind of investment is not strong. Moreover, funding such a development is a high risk for an individual supplier. The problem is compounded by a disconnect between the tool customer (the mask supplier) and the final mask customer that will bear the increased costs if a high speed writer is not available. Since no individual company will likely risk entering this market, some type of industry-wide funding model will be needed. Because SEMATECH's member companies strongly support a multiple beam technology for mask writers to reduce the write time and cost of 193 nm and EUV masks, SEMATECH plans to pursue an advanced mask writer program in 2011 and 2012. In 2010, efforts will focus on identifying a funding model to address the investment to develop such a technology.

  5. An evaluation of a novel mask in four patients with obstructive sleep apnea and overlap syndromes.

    Science.gov (United States)

    Yarahmadi, Alireza; Nader, Nader D; Zadeii, Gino; Porhomayon, Jahan

    2013-01-01

    We present four cases of adults with obstructive sleep apnea in whom positive airway pressure therapy alone failed to provide adequate oxygenation. We have previously reported the use of dual mask for ventilatory support of a patient postoperatively (Porhomayon et al., 2013). Here, we report an evaluation of the dual mask in four patients with overlap syndromes. Application of dual mask provided adequate oxygenation with lower continuous positive airway pressure (CPAP)/bilevel positive airway pressure (BIPAP) pressure levels. PMID:23970903

  6. An Evaluation of a Novel Mask in Four Patients with Obstructive Sleep Apnea and Overlap Syndromes

    OpenAIRE

    Alireza Yarahmadi; Nader, Nader D; Gino Zadeii; Jahan Porhomayon

    2013-01-01

    We present four cases of adults with obstructive sleep apnea in whom positive airway pressure therapy alone failed to provide adequate oxygenation. We have previously reported the use of dual mask for ventilatory support of a patient postoperatively (Porhomayon et al., 2013). Here, we report an evaluation of the dual mask in four patients with overlap syndromes. Application of dual mask provided adequate oxygenation with lower continuous positive airway pressure (CPAP)/bilevel positive airway...

  7. An Evaluation of a Novel Mask in Four Patients with Obstructive Sleep Apnea and Overlap Syndromes

    Directory of Open Access Journals (Sweden)

    Alireza Yarahmadi

    2013-01-01

    Full Text Available We present four cases of adults with obstructive sleep apnea in whom positive airway pressure therapy alone failed to provide adequate oxygenation. We have previously reported the use of dual mask for ventilatory support of a patient postoperatively (Porhomayon et al., 2013. Here, we report an evaluation of the dual mask in four patients with overlap syndromes. Application of dual mask provided adequate oxygenation with lower continuous positive airway pressure (CPAP/bilevel positive airway pressure (BIPAP pressure levels.

  8. Use of a spatial light modulator as an adaptable phase mask for wavefront coding

    OpenAIRE

    Carles, Guillem; Muyo, G; Bosch i Puig, Salvador; Harvey, A R

    2010-01-01

    A wavefront-coded imaging system employing a spatial light modulator (SLM) for the agile implementation of phase masks is presented. The SLM is a liquid crystal display that can be modulated to implement cubic phase masks of variable coding strength. These phase masks produce broad point spread functions insensitive to defocus aberration and are used in combination with post-detection digital image processing to extend the depth-of-field of an imaging system. A detailed description of the cal...

  9. Symmetry: modeling the effects of masking noise, axial cueing and salience.

    Science.gov (United States)

    Chen, Chien-Chung; Tyler, Christopher W

    2010-04-06

    Symmetry detection is an interesting probe of pattern processing because it requires the matching of novel patterns without the benefit of prior recognition. However, there is evidence that prior knowledge of the axis location plays an important role in symmetry detection. We investigated how the prior information about the symmetry axis affects symmetry detection under noise-masking conditions. The target stimuli were random-dot displays structured to be symmetric about vertical, horizontal, or diagonal axes and viewed through eight apertures (1.2 degrees diameter) evenly distributed around a 6 degrees diameter circle. The information about axis orientation was manipulated by (1) cueing of axis orientation before the trial and (2) varying axis salience by including or excluding the axis region within the noise apertures. The percentage of correct detection of the symmetry was measured at for a range of both target and masking noise densities. The threshold vs. noise density function was flat at low noise density and increased with a slope of 0.75-0.8 beyond a critical density. Axis cueing reduced the target threshold 2-4 fold at all noise densities while axis salience had an effect only at high noise density. Our results are inconsistent with an ideal observer or signal-to-noise account of symmetry detection but can be explained by a multiple-channel model is which the response in each channel is the ratio between the nonlinear transform of the responses of sets of early symmetry detectors and the sum of external and intrinsic sources of noise.

  10. The narcissistic mask: an exploration of 'the defensive grandiosity hypothesis'.

    Science.gov (United States)

    Thomas, Justin; Hashmi, Amani Al; Chung, Man Cheung; Morgan, Keith; Lyons, Minna

    2013-05-01

    Narcissism has been conceptualized as involving attempts to defend against negative self-schemata (implicit negative beliefs about one's own self-worth). This idea has been termed the 'mask model of narcissism'. This study explores the mask model, examining the association between extreme narcissistic personality traits and performance on a task purported to assess the influence of negative self-schemata. Participants (n = 232) from the UK and the UAE completed the Narcissistic Personality Inventory and also performed an incidental learning task involving the surprise recall of self-referential adjectives (traits). A greater recall of negative adjectives was viewed as indicative of negative self-schemata. Looking at the sample as a whole, there were no associations between narcissistic traits and negative adjective recall. However, amongst those scoring in the upper quartile of the Narcissistic Personality Inventory, narcissism scores were positively correlated with the recall of negative adjectives even after controlling for age and memory. Narcissism may reflect self-enhancement strategies rooted in negative self-beliefs. PMID:24343942

  11. Optimisation of microencapsulation of turmeric extract for masking flavour.

    Science.gov (United States)

    Laokuldilok, Natcha; Thakeow, Prodpran; Kopermsub, Phikunthong; Utama-ang, Niramon

    2016-03-01

    The aim of this study was to evaluate the odour masking property, encapsulation efficiency and physicochemical properties of turmeric extract prepared by a binary blend of wall materials, i.e. brown rice flour (BRF) and beta-cyclodextrin (β-CD). Response surface methodology was applied to investigate the effect of encapsulation processing variables, including core loading mass (5-25%) and β-CD (5-20%) concentration on product recovery, moisture content, hygroscopicity, curcuminoids encapsulation and volatile release. To investigate odour masking properties of a wall material combination, volatiles in headspace were monitored by GC-MS using ar-turmerone and 2-methyl-4-vinylguaiacol as marker compounds to represent turmeric extract. The obtained results revealed an optimal encapsulation process was 5% of core loading mass with addition 20g/L of β-CD, since it enabled high curcuminoids encapsulation with low volatile release, moisture content and hygroscopicity. Turmeric powder with reduced odour can be used as a nutrient supplement or natural colorant for food products.

  12. Developing a Method to Mask Trees in Commercial Multispectral Imagery

    Science.gov (United States)

    Becker, S. J.; Daughtry, C. S. T.; Jain, D.; Karlekar, S. S.

    2015-12-01

    The US Army has an increasing focus on using automated remote sensing techniques with commercial multispectral imagery (MSI) to map urban and peri-urban agricultural and vegetative features; however, similar spectral profiles between trees (i.e., forest canopy) and other vegetation result in confusion between these cover classes. Established vegetation indices, like the Normalized Difference Vegetation Index (NDVI), are typically not effective in reliably differentiating between trees and other vegetation. Previous research in tree mapping has included integration of hyperspectral imagery (HSI) and LiDAR for tree detection and species identification, as well as the use of MSI to distinguish tree crowns from non-vegetated features. This project developed a straightforward method to model and also mask out trees from eight-band WorldView-2 (1.85 meter x 1.85 meter resolution at nadir) satellite imagery at the Beltsville Agricultural Research Center in Beltsville, MD spanning 2012 - 2015. The study site included tree cover, a range of agricultural and vegetative cover types, and urban features. The modeling method exploits the product of the red and red edge bands and defines accurate thresholds between trees and other land covers. Results show this method outperforms established vegetation indices including the NDVI, Soil Adjusted Vegetation Index, Normalized Difference Water Index, Simple Ratio, and Normalized Difference Red Edge Index in correctly masking trees while preserving the other information in the imagery. This method is useful when HSI and LiDAR collection are not possible or when using archived MSI.

  13. High Reading Skills Mask Dyslexia in Gifted Children.

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H; Slot, Esther M; de Bree, Elise H

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with dyslexia). The test battery included measures of literacy (reading/spelling) and cognitive abilities related to literacy and language (phonological awareness [PA], rapid automatized naming [RAN], verbal short-term memory [VSTM], working memory [WM], grammar, and vocabulary). It was hypothesized that gifted children with dyslexia would outperform children with dyslexia on literacy tests. In addition, a core-deficit model including dyslexia-related weaknesses and a compensational model involving giftedness-related strengths were tested using Bayesian statistics to explain their reading/spelling performance. Gifted children with dyslexia performed on all literacy tests in between children with dyslexia and TD children. Their cognitive profile showed signs of weaknesses in PA and RAN and strengths in VSTM, WM, and language skills. Findings indicate that phonology is a risk factor for gifted children with dyslexia, but this is moderated by other skills such as WM, grammar, and vocabulary, providing opportunities for compensation of a cognitive deficit and masking of literacy difficulties.

  14. High Reading Skills Mask Dyslexia in Gifted Children.

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H; Slot, Esther M; de Bree, Elise H

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with dyslexia). The test battery included measures of literacy (reading/spelling) and cognitive abilities related to literacy and language (phonological awareness [PA], rapid automatized naming [RAN], verbal short-term memory [VSTM], working memory [WM], grammar, and vocabulary). It was hypothesized that gifted children with dyslexia would outperform children with dyslexia on literacy tests. In addition, a core-deficit model including dyslexia-related weaknesses and a compensational model involving giftedness-related strengths were tested using Bayesian statistics to explain their reading/spelling performance. Gifted children with dyslexia performed on all literacy tests in between children with dyslexia and TD children. Their cognitive profile showed signs of weaknesses in PA and RAN and strengths in VSTM, WM, and language skills. Findings indicate that phonology is a risk factor for gifted children with dyslexia, but this is moderated by other skills such as WM, grammar, and vocabulary, providing opportunities for compensation of a cognitive deficit and masking of literacy difficulties. PMID:24935885

  15. Development of taste masked film of valdecoxib for oral use

    Directory of Open Access Journals (Sweden)

    Sharma Renuka

    2007-01-01

    Full Text Available The aim of the present investigation was to develop oral films of valdecoxib using Eudragit EPO and hydroxypropylmethylcellulose. Films of Eudragit EPO, hydroxypropylmethylcellulose and Eudragit EPO combined with hydroxypropylmethylcellulose were prepared by film casting method. Glycerol, menthol and aspartame were incorporated in the drug containing films as plasticizer, cooling agent and sweetener, respectively. The drug loading was 10 mg valdecoxib per 4 cm2 of the film. The films were evaluated for hydration study, folding endurance and in vitro drug dissolution in the distilled water. The films containing both Eudragit EPO and hydroxypropylmethylcellulose films showed neutral surface pH when prepared using 0.1 N HCl as a solvent. Glycerol played a critical role in imparting flexibility to the film and improving the drug release from film. The bitter taste of the drug was masked by using aspartame and menthol accompanied by the synergistic effect of Eudragit and glycerol. Water uptake by films was found to be dependant both on the amount of Eudragit EPO and glycerol. The films containing the higher proportion of glycerol showed higher water uptake and faster drug release at all the sampling time in the in vitro dissolution test. Optimum plasticity was obtained using the required concentration of hydroxypropylmethylcellulose and glycerol. The study revealed that taste masked valdecoxib films can be developed by the selection of appropriate film former and by the use of auxiliary excipients.

  16. Optimisation of microencapsulation of turmeric extract for masking flavour.

    Science.gov (United States)

    Laokuldilok, Natcha; Thakeow, Prodpran; Kopermsub, Phikunthong; Utama-ang, Niramon

    2016-03-01

    The aim of this study was to evaluate the odour masking property, encapsulation efficiency and physicochemical properties of turmeric extract prepared by a binary blend of wall materials, i.e. brown rice flour (BRF) and beta-cyclodextrin (β-CD). Response surface methodology was applied to investigate the effect of encapsulation processing variables, including core loading mass (5-25%) and β-CD (5-20%) concentration on product recovery, moisture content, hygroscopicity, curcuminoids encapsulation and volatile release. To investigate odour masking properties of a wall material combination, volatiles in headspace were monitored by GC-MS using ar-turmerone and 2-methyl-4-vinylguaiacol as marker compounds to represent turmeric extract. The obtained results revealed an optimal encapsulation process was 5% of core loading mass with addition 20g/L of β-CD, since it enabled high curcuminoids encapsulation with low volatile release, moisture content and hygroscopicity. Turmeric powder with reduced odour can be used as a nutrient supplement or natural colorant for food products. PMID:26471609

  17. Optimal Phase Masks for High Contrast Imaging Applications

    Science.gov (United States)

    Ruane, Garreth J.

    Phase-only optical elements can provide a number of important functions for high-contrast imaging. This thesis presents analytical and numerical optical design methods for accomplishing specific tasks, the most significant of which is the precise suppression of light from a distant point source. Instruments designed for this purpose are known as coronagraphs. Here, advanced coronagraph designs are presented that offer improved theoretical performance in comparison to the current state-of-the-art. Applications of these systems include the direct imaging and characterization of exoplanets and circumstellar disks with high sensitivity. Several new coronagraph designs are introduced and, in some cases, experimental support is provided. In addition, two novel high-contrast imaging applications are discussed: the measurement of sub-resolution information using coronagraphic optics and the protection of sensors from laser damage. The former is based on experimental measurements of the sensitivity of a coronagraph to source displacement. The latter discussion presents the current state of ongoing theoretical work. Beyond the mentioned applications, the main outcome of this thesis is a generalized theory for the design of optical systems with one of more phase masks that provide precise control of radiation over a large dynamic range, which is relevant in various high-contrast imaging scenarios. The optimal phase masks depend on the necessary tasks, the maximum number of optics, and application specific performance measures. The challenges and future prospects of this work are discussed in detail.

  18. Development of a Taste-Masked Orodispersible Film Containing Dimenhydrinate

    Directory of Open Access Journals (Sweden)

    Jörg Breitkreutz

    2012-10-01

    Full Text Available Orodispersible dosage forms are promising new approaches for drug delivery. They enable an easy application, as there is no need to drink high amounts of liquids or swallow large solid dosage forms. The aim of the study was to develop an orodispersible film (ODF as an alternative to tablets, syrups or suppositories for the treatment of vomiting and nausea, especially for the pediatric population. Formulations were investigated by X-ray diffraction, scanning electron and polarized light microscopy. Additionally, two commercially available electronic taste sensing systems were used to investigate the applied taste-masking strategies. Results obtained from X-ray-diffraction and polarized light microscopy showed no recrystallization of dimenhydrinate in the formulation when cyclodextrin or maltodextrin were used as solubilizing and complexing agent. All ODFs showed fast disintegration depending on the characterization method. In order to get taste information, the dimenhydrinate formulations were analytically compared to pure drug and drug-free formulations by electronic tongues. Results obtained from both systems are comparable and were used together for the first time. It was possible to develop an ODF of dimenhydrinate that is fast disintegrating even in small volumes of liquid. Furthermore, in vitro taste assessment by two electronic tongues revealed taste-masking effects by the excipients.

  19. Upgrading the control system of the movable masks for KEKB

    International Nuclear Information System (INIS)

    The positron ring and the electron ring of KEKB have their own dedicated movable masks to cut off spent electrons/positrons near the beam orbit to reduce background in the detector. The stepping motor drivers of the movable masks were controlled by a Programable Logic Controller (PLC), which was supervised by a VME-based IOC. The IOC and the PLC was connected with each other by using GP-IB interface for the communication. Recently, however, the GP-IB connection came to be unstable causing communication errors between the IOC and the PLC. In order to solve the problem, a new type of IOC, which runs Linux on a CPU module of FA-M3 PLC, has been adopted. The CPU functions with standard I/O modules of FA-M3 on the PLC-bus. In this control system, we replaced an existing ladder CPU with the IOC and the ladder program with an EPICS sequencer program for the efficiency of software development and ease of maintenance. The new IOC has been successfully serving since it was put in operation in September 2008. In this paper, we describe the details of the new control system and its experiences up to the date. (author)

  20. Mapping epitopes and antigenicity by site-directed masking

    Science.gov (United States)

    Paus, Didrik; Winter, Greg

    2006-06-01

    Here we describe a method for mapping the binding of antibodies to the surface of a folded antigen. We first created a panel of mutant antigens (-lactamase) in which single surface-exposed residues were mutated to cysteine. We then chemically tethered the cysteine residues to a solid phase, thereby masking a surface patch centered on each cysteine residue and blocking the binding of antibodies to this region of the surface. By these means we mapped the epitopes of several mAbs directed to -lactamase. Furthermore, by depleting samples of polyclonal antisera to the masked antigens and measuring the binding of each depleted sample of antisera to unmasked antigen, we mapped the antigenicity of 23 different epitopes. After immunization of mice and rabbits with -lactamase in Freund's adjuvant, we found that the antisera reacted with both native and denatured antigen and that the antibody response was mainly directed to an exposed and flexible loop region of the native antigen. By contrast, after immunization in PBS, we found that the antisera reacted only weakly with denatured antigen and that the antibody response was more evenly distributed over the antigenic surface. We suggest that denatured antigen (created during emulsification in Freund's adjuvant) elicits antibodies that bind mainly to the flexible regions of the native protein and that this explains the correlation between antigenicity and backbone flexibility. Denaturation of antigen during vaccination or natural infections would therefore be expected to focus the antibody response to the flexible loops. backbone flexibility | Freund's adjuvant | conformational epitope | antisera

  1. Masked rat: an x-ray-induced mutant with chronic blepharitis, alopecia, and pasteurellosis

    International Nuclear Information System (INIS)

    An autosomal recessive mutation had been previously x-ray-induced in the rat and named the masked rat (genotype mk/mk). This study describes the mutant's appearance, histology, and microflora. The rat's eyelids were swollen, often to the point of closure, and its face was partially covered by a brownish crust, giving the mutant a mask-like appearance. The chronic blepharitis was also accompanied by alopecia that appeared as bare patches across the mutant's back. Pasteurella pneumotropica was found in eyelids and on skin from all masked rats. The normal rat demonstrated a resistance to Pasteurella pneumotropica infection, or, conversely, the masked rat appeared to be genetically predisposed to pasteurellosis

  2. The Bawdy, Brawling, Boisterous World of Korean Mask Dance Dramas: A Brief Essay to Accompany Photographs

    OpenAIRE

    CedarBough Saeji

    2012-01-01

    Korean mask dance dramas are captivating and entrancing. Comedy, tragedy, and social commentary meld with energetic dance, distinctive masks, and lively music. These dramas are often colloquially and incorrectly referred to as talchum (“mask dance”) in Korean—in fact, talchum is one of the major variants of mask dance drama from Hwanghae Province in present-day North Korea. Performers of other variants have long objected to the broad application of the term (akin to calling all in-line skates...

  3. Long-range tactile masking occurs in the postural body schema.

    Science.gov (United States)

    D'Amour, Sarah; Harris, Laurence R

    2016-02-01

    Long-range tactile masking has been reported between mirror symmetric body locations. This suggests a general principle of contralateral inhibition between corresponding points on each side of the body that may serve to enhance distinguishing touches on the two halves of the body. Do such effects occur before or after posture is added to the body schema? Here, we address this question by exploring the effect of arm position on long-range tactile masking. The influence of arm position was investigated using different positions of both the test and masking arms. Tactile sensitivity was measured on one forearm, while vibrotactile-masking stimulation was applied to the opposite arm or to a control site on the shoulder. No difference was found in sensitivity when test arm position was varied. Physical contact between the arms significantly increased the effectiveness of a masking stimulus applied to the other arm. Long-range masking between the arms was strongest when the arms were held parallel to each other and was abolished if the position of either the test arm or the masking arm was moved from this position. Modulation of the effectiveness of masking by the position of both the test and masking arms suggests that these effects occur after posture information is added to the body's representation in the brain.

  4. Performance of an Achromatic Focal Plane Mask for Exoplanet Imaging Coronagraphy

    Science.gov (United States)

    Newman, Kevin; Belikov, Ruslan; Pluzhnik, Eugene; Balasubramanian, Kunjithapatham; Wilson, Dan

    2014-01-01

    Coronagraph technology combined with wavefront control is close to achieving the contrast and inner working angle requirements in the lab necessary to observe the faint signal of an Earth-like exoplanet in monochromatic light. An important remaining technological challenge is to achieve high contrast in broadband light. Coronagraph bandwidth is largely limited by chromaticity of the focal plane mask, which is responsible for blocking the stellar PSF. The size of a stellar PSF scales linearly with wavelength; ideally, the size of the focal plane mask would also scale with wavelength. A conventional hard-edge focal plane mask has a fixed size, normally sized for the longest wavelength in the observational band to avoid starlight leakage. The conventional mask is oversized for shorter wavelengths and blocks useful discovery space. Recently we presented a solution to the size chromaticity challenge with a focal plane mask designed to scale its effective size with wavelength. In this paper, we analyze performance of the achromatic size-scaling focal plane mask within a Phase Induced Amplitude Apodization (PIAA) coronagraph. We present results from wavefront control around the achromatic focal plane mask, and demonstrate the size-scaling effect of the mask with wavelength. The edge of the dark zone, and therefore the inner working angle of the coronagraph, scale with wavelength. The achromatic mask enables operation in a wider band of wavelengths compared with a conventional hard-edge occulter.

  5. The Bawdy, Brawling, Boisterous World of Korean Mask Dance Dramas: A Brief Essay to Accompany Photographs

    Directory of Open Access Journals (Sweden)

    CedarBough Saeji

    2012-09-01

    Full Text Available Korean mask dance dramas are captivating and entrancing. Comedy, tragedy, and social commentary meld with energetic dance, distinctive masks, and lively music. These dramas are often colloquially and incorrectly referred to as talchum (“mask dance” in Korean—in fact, talchum is one of the major variants of mask dance drama from Hwanghae Province in present-day North Korea. Performers of other variants have long objected to the broad application of the term (akin to calling all in-line skates “Rollerblades” or all MP3 players “iPods”. Only in the late 1990s did academia catch on, when two highly respected midcareer mask dance drama scholars, Bak Jintae (Daegu University and Jeon Kyungwook (Korea University, began to use the terminology talnoli (“mask play” and gamyeon-geuk (“mask drama” in their publications.I needed to watch only one performance, in 1997, to fall in love with the mask dance dramas, but at first the many forms of the genre melded together in my mind. It took repeated exposure and study over more than a dozen years for me to see the profound similarities and differences among all of Korea’s mask dance dramas...

  6. EUVL printing results of a low-thermal expansion material (LTEM) mask

    Science.gov (United States)

    Tong, William M.; Taylor, John S.; Hector, Scott D.; Shell, Melissa K.; Zhang, Guojing; Kearney, Patrick A.; Walton, Christopher C.; Larson, Cindy C.; Wasson, James R.; Mangat, Pawitter J. S.; O'Connell, Donna J.; Folk, Daniel R.

    2000-07-01

    Minimizing image placement errors due to thermal distortion of the mask is a key requirement for qualifying EUV Lithography as a Next Generation Lithography (NGL). Employing Low Thermal Expansion Materials (LTEMs) for mask substrates is a viable solution for controlling mask thermal distortion and is being investigated by a wide array of researchers, tool makers, photomask suppliers, and material manufacturers. Finite element modeling has shown that an EUVL mask with a Coefficient of Thermal Expansion (CTE) of less than 20 ppb/K will meet overlay error budgets for EQ 70 nm lithography at a throughput of 80 wafers per hour. In this paper, we describe the functional differences between today's photomask and EUVL masks; some of these differences are EUVL specific, while others are natural consequences of the shrinking critical dimension. We demonstrate that a feasible manufacturing pathway exists for Low Thermal Expansion Material (LTEM) EUVL masks by fabricating a wafer-shaped LTEM mask substrate using the same manufacturing steps as for fabricating Si wafers. The LTEM substrate was then coated with Mo/Si multilayers, patterned, and printed using the 10X Microstepper. The images were essentially indistinguishable from those images acquired from masks fabricated from high quality silicon wafers as substrates. Our observations lend further evidence that an LTEM can be used as the EUVL mask substrate material.

  7. Intelligibility Assessment of Ideal Binary-Masked Noisy Speech with Acceptance of Room Acoustic

    Science.gov (United States)

    Vladimír, Sedlak; Daniela, Durackova; Roman, Zalusky; Tomas, Kovacik

    2015-01-01

    In this paper the intelligibility of ideal binary-masked noisy signal is evaluated for different signal to noise ratio (SNR), mask error, masker types, distance between source and receiver, reverberation time and local criteria for forming the binary mask. The ideal binary mask is computed from time-frequency decompositions of target and masker signals by thresholding the local SNR within time-frequency units. The intelligibility of separated signal is measured using different objective measures computed in frequency and perceptual domain. The present study replicates and extends the findings which were already presented but mainly shows impact of room acoustic on the intelligibility performance of IBM technique.

  8. Affective Urbanism

    DEFF Research Database (Denmark)

    Samson, Kristine

    . Under these circumstances affective aesthetics operate strategically within the urban field of interests, capital flows and desires of the social. This ‘affective urbanism’ (Anderson & Holden 2008) is linked to a society influenced by new kinds of information flows, where culture is mediated and enacted...... and cultural festivals, both practices indicate that design is implemented as means of creating affective spaces in the city. Both cases show how immaterial production of affects and emotions in the city can be seen in relation to economic potential and urban development. Finally, I will discuss whether urban......Urban design and architecture are increasingly used as material and affective strategies for setting the scene, for manipulation and the production of urban life: The orchestration of atmospheres, the framing and staging of urban actions, the programming for contemplation, involvement, play...

  9. Study of effects of sidewall angle on process window using 193nm CPL masks in a 300mm wafer manufacturing environment

    Science.gov (United States)

    Cheng, Yung Feng; Chou, Yueh Lin; Lin, C. L.; Huang, Peter

    2005-11-01

    As semiconductor process technology moves down below 90nm and 65nm, more and more wafer fabs are starting to apply 193nm CPL (Chromeless Phase Lithography) technology as the main lithography strategy for their most critical layers. However the 3D pattern profile is another critical factor, which affects image intensity and final process window. Since 193nm CPL is a relatively new technology in the semiconductor industry, it is important for us to understand the key mask specifications of 193nm CPL and their impact on wafer-level imaging. In this paper, we will study the effects of sidewall angle on process window and wafer CD using 193nm CPL masks in a 300mm wafer manufacturing environment. We begin our experiment by making several special 193nm CPL masks. These masks have been specially designed with different sidewall angles (SWA) with phase of 180 degrees. The sidewall angle spread represents approximately 10 degrees. We use specially designed test patterns that are compatible at the 65nm technology node. In our experiment, we first study the correlation between AFM (atomic force microscope)-determined profile angle and lithographic process behavior. In addition, simulation was also used to predict the impact of 3D profile on process performance. All lithographic experiments were performed on 300mm wafers using a high NA ASML 193nm scanner and high contrast resist. In this study, we have focused on the impact of sidewall angle on wafer process performance by comparing the wafer CD and pattern profile through focus. In order to establish more effective specifications of angle control in 193nm CPL between mask shop and wafer fabs, all AFM, wafer CD, and simulation results will be compared and correlated.

  10. Close-loop simulation of the medial olivocochlear anti-masking effects

    Science.gov (United States)

    Liu, Yi-Wen; Yu, Lu-Ming; Wu, Po-Jui

    2015-12-01

    The medial olivocochlear reflex (MOCR) is known to affect cochlear signal processing via the electromechanical changes it induces in outer hair cells (OHCs). Experiments showed that electrically stimulating the MOC efferents (i.e., open-loop stimulation) suppresses cochlear responses to acoustic noise while enhancing the response to tone bursts if the signal-to-noise ratio is sufficiently high [5]. However, such experiments did not reveal precisely how MOCR affects cochlear signal processing in a close loop. Presently we have built an integrated computer model for the MOCR pathway; the constituting sub-models include a model for cochlear mechanics with electromotile OHCs [11], a neurotransmitter release model for the synapse between inner hair cells (IHCs) and spiral ganglion cells [16], an electrical model for the T-multipolar (TM) cells in the cochlear nucleus [6], a relay from TM cells to the MOC interneurons, and a convolution kernel describing the change of OHC potassium conductance triggered by the MOC inhibitory post synaptic potentials. Thus, close-loop responses of the entire system can be simulated for arbitrary acoustic stimuli. Both open-loop and close-loop simulations demonstrate a decrease in the auditory nerve fiber (ANF) response to noise but an increase in the response to high-level tone bursts. The present integrated computer model can potentially be used for testing hypotheses regarding the physiological mechanisms for MOC anti-masking effects.

  11. Improving the privacy of optical steganography with temporal phase masks.

    Science.gov (United States)

    Wang, Z; Fok, M P; Xu, L; Chang, J; Prucnal, P R

    2010-03-15

    Temporal phase modulation of spread stealth signals is proposed and demonstrated to improve optical steganography transmission privacy. After phase modulation, the temporally spread stealth signal has a more complex spectral-phase-temporal relationship, such that the original temporal profile cannot be restored when only dispersion compensation is applied to the temporally spread stealth signals. Therefore, it increases the difficulty for the eavesdropper to detect and intercept the stealth channel that is hidden under a public transmission, even with a correct dispersion compensation device. The experimental results demonstrate the feasibility of this approach and display insignificant degradation in transmission performance, compared to the conventional stealth transmission without temporal phase modulation. The proposed system can also work without a clock transmission for signal synchronization. Our analysis and simulation results show that it is difficult for the adversary to detect the existence of the stealth transmission, or find the correct phase mask to recover the stealth signals.

  12. Class III treatment using facial mask: Stability after 10 years

    Directory of Open Access Journals (Sweden)

    Adilson Luiz Ramos

    2014-10-01

    Full Text Available Early Class III malocclusion treatment may not have long-term stability due to mandibular growth. Although some features of this malocclusion point to a better prognosis, it is practically impossible for the orthodontist to foresee cases that require new intervention. Many patients need retreatment, whether compensatory or orthodontic-surgical. The present study reports the case of a Class III patient treated at the end of the mixed dentition with the use of a face mask followed by conventional fixed appliances. The case remains stable 10 years after treatment completion. It was presented to the Brazilian Board of Orthodontics and Dentofacial Orthopedics (BBO as a requirement for the title of certified by the BBO.

  13. Laryngeal mask airway (LMA) artefact resulting in MRI misdiagnosis

    Energy Technology Data Exchange (ETDEWEB)

    Schieble, Thomas [University of Medicine and Dentistry of New Jersey, Department of Anesthesiology, New Jersey Medical School, Newark, NJ (United States); Maimonides Medical Center, Department of Anesthesiology, Brooklyn, NY (United States); Patel, Anuradha; Davidson, Melissa [University of Medicine and Dentistry of New Jersey, Department of Anesthesiology, New Jersey Medical School, Newark, NJ (United States)

    2008-03-15

    We report a 7-year-old child who underwent brain MRI for a known seizure disorder. The technique used for general anesthesia included inhalation induction followed by placement of a laryngeal mask airway (LMA) for airway maintenance. Because the reviewing radiologist was unfamiliar with the use of an LMA during anesthesia, and because the attending anesthesiologist did not communicate his technique to the radiologist, an MRI misdiagnosis was reported because of artefact created by the in situ LMA. As a result of this misdiagnosis the child was subjected to unnecessary subsequent testing to rule out a reported anatomic abnormality induced by the LMA. Our case illustrates the need for coordination of patient care among hospital services. (orig.)

  14. Optical Synchrotron Radiation Beam Imaging with a Digital Mask

    Energy Technology Data Exchange (ETDEWEB)

    Fiorito, R. B. [University of Maryland, College Park, MD (United States); Zhang, H. D. [University of Maryland, College Park, MD (United States); Corbett, W. J. [SLAC, Menlo Park, CA (United States); Fisher, A. S. [SLAC, Menlo Park, CA (United States); Mok, W. Y. [SLAC, Menlo Park, CA (United States); Tian, K. [SLAC, Menlo Park, CA (United States); Douglas, D. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Wilson, F. G. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Zhang, S. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Mitsuhashi, T. M. [KEK, Tsukuba (Japan); Shkvarunets, A. G. [University of Maryland, College Park, MD (United States)

    2012-11-01

    We have applied a new imaging/optical masking technique, which employs a digital micro-mirror device (DMD) and optical synchrotron radiation (OSR), to perform high dynamic range (DR) beam imaging at the JLAB Energy Recovery Linac and the SLAC/SPEAR3 Synchrotron Light Source. The OSR from the beam is first focused onto the DMD to produce a primary image; selected areas of this image are spatially filtered by controlling the state of individual micro-mirrors; and finally, the filtered image is refocused onto a CCD camera. At JLAB this technique has been used successfully to view the beam halo with a DR ~ 105. At SPEAR3 the DMD was used to filter out the bright core of the stored beam to study the turn-by-turn dynamics of the 10-3 weaker injected beam. We describe the optical performance, present limitations and our plans to improve the DR of both experimental systems.

  15. An improved algorithm of mask image dodging for aerial image

    Science.gov (United States)

    Zhang, Zuxun; Zou, Songbai; Zuo, Zhiqi

    2011-12-01

    The technology of Mask image dodging based on Fourier transform is a good algorithm in removing the uneven luminance within a single image. At present, the difference method and the ratio method are the methods in common use, but they both have their own defects .For example, the difference method can keep the brightness uniformity of the whole image, but it is deficient in local contrast; meanwhile the ratio method can work better in local contrast, but sometimes it makes the dark areas of the original image too bright. In order to remove the defects of the two methods effectively, this paper on the basis of research of the two methods proposes a balance solution. Experiments show that the scheme not only can combine the advantages of the difference method and the ratio method, but also can avoid the deficiencies of the two algorithms.

  16. A scatterometry inverse problem in optical mask metrology

    Science.gov (United States)

    Model, R.; Rathsfeld, A.; Gross, H.; Wurm, M.; Bodermann, B.

    2008-11-01

    We discuss the solution of the inverse problem in scatterometry i.e. the determination of periodic surface structures from light diffraction patterns. With decreasing details of lithography masks, increasing demands on metrology techniques arise. By scatterometry as a non-imaging indirect optical method critical dimensions (CD) like side-wall angles, heights, top and bottom widths are determined. The numerical simulation of diffraction is based on the finite element solution of the Helmholtz equation. The inverse problem seeks to reconstruct the grating geometry from measured diffraction patterns. The inverse operator maps efficiencies of diffracted plane wave modes to the grating parameters. We employ a Newton type iterative method to solve the resulting minimum problem. The reconstruction quality surely depends on the angles of incidence, on the wave lengths and/or the number of propagating scattered wave modes and will be discussed by numerical examples.

  17. The Investigation on Mask and Plasticine Laser Shock Forming

    Directory of Open Access Journals (Sweden)

    Li Liyin

    2016-01-01

    Full Text Available A novel technology called mask and plasticine laser shock forming (MAPLSF was introduced to manufacture micro-features on the surface of pure copper foil with the thickness of 40μm. In this process, the laser-generated shock wave and plasticine are used to replace the conventional rigid punch and die. The result showed that the shape of laser beam can be roughly manufactured on the surface of the workpiece and this mold-free laser shock forming process is a fast method to fabricate controlled micro-feature on the metallic foils. In this damage-free forming process, the workpicec can keep good surface, because the plasticine is softer than metal foils.

  18. Systematic study of source mask optimization and verification flows

    Science.gov (United States)

    Ben, Yu; Latypov, Azat; Chua, Gek Soon; Zou, Yi

    2012-06-01

    Source mask optimization (SMO) emerged as powerful resolution enhancement technique (RET) for advanced technology nodes. However, there is a plethora of flow and verification metrics in the field, confounding the end user of the technique. Systemic study of different flows and the possible unification thereof is missing. This contribution is intended to reveal the pros and cons of different SMO approaches and verification metrics, understand the commonality and difference, and provide a generic guideline for RET selection via SMO. The paper discusses 3 different type of variations commonly arise in SMO, namely pattern preparation & selection, availability of relevant OPC recipe for freeform source and finally the metrics used in source verification. Several pattern selection algorithms are compared and advantages of systematic pattern selection algorithms are discussed. In the absence of a full resist model for SMO, alternative SMO flow without full resist model is reviewed. Preferred verification flow with quality metrics of DOF and MEEF is examined.

  19. Affective Maps

    DEFF Research Database (Denmark)

    Salovaara-Moring, Inka

    . In particular, mapping environmental damage, endangered species, and human made disasters has become one of the focal point of affective knowledge production. These ‘more-than-humangeographies’ practices include notions of species, space and territory, and movement towards a new political ecology. This type...... of environmental knowledge production. It uses InfoAmazonia, the databased platform on Amazon rainforests, as an example of affective geo-visualization within information mapping that enhances embodiment in the experience of the information. Amazonia is defined as a digitally created affective (map)space within...

  20. Masking of vitamin B12 deficiency associated neuropathy by folic acid

    NARCIS (Netherlands)

    Amsterdam JGC van; Opperhuizen A; Jansen EHJM; TOX

    2005-01-01

    The Dutch authorities consider fortifying certain foods with folic acid. Folic acid supplementation may, however, mask vitamin B12 deficiency and increase the incidence of peripheral neuropathy. This literature review outlines published studies to the potential masking of vitamin B12 deficiency rel

  1. Some Sufficient Conditions for Convergent Multivariate Subdivision Schemes with Nonnegative Finite Masks

    Institute of Scientific and Technical Information of China (English)

    Min WU; Jia Li ZHOU

    2012-01-01

    It is well known that the convergence of multivariate subdivision schemes with finite masks can be characterized via joint spectral radius.For nonnegative masks,we will present in this paper some computable simply sufficient conditions for the convergence,which will cover a substantially large class of schemes.

  2. Reflective Occultation Mask for Evaluation of Occulter Designs for Planet Finding

    Science.gov (United States)

    Hagopian, John; Lyon, Richard; Shiri, Shahram; Roman, Patrick

    2011-01-01

    Advanced formation flying occulter designs utilize a large occulter mask flying in formation with an imaging telescope to block and null starlight to allow imaging of faint planets in exosolar systems. A paper describes the utilization of subscale reflective occultation masks to evaluate formation flying occulter designs. The use of a reflective mask allows mounting of the occulter by conventional means and simplifies the test configuration. The innovation alters the test set-up to allow mounting of the mask using standard techniques to eliminate the problems associated with a standard configuration. The modified configuration uses a reflective set-up whereby the star simulator reflects off of a reflective occulting mask and into an evaluation telescope. Since the mask is sized to capture all rays required for the imaging test, it can be mounted directly to a supporting fixture without interfering with the beam. Functionally, the reflective occultation mask reflects light from the star simulator instead of transmitting it, with a highly absorptive carbon nanotube layer simulating the occulter blocking mask. A subscale telescope images the star source and companion dim source that represents a planet. The primary advantage of this is that the occulter can be mounted conventionally instead of using diffractive wires or magnetic levitation.

  3. Coronagraph Focal-Plane Phase Masks Based on Photonic Crystal Technology: Recent Progress and Observational Strategy

    Science.gov (United States)

    Murakami, Naoshi; Nishikawa, Jun; Sakamoto, Moritsugu; Ise, Akitoshi; Oka, Kazuhiko; Baba, Naoshi; Murakami, Hiroshi; Tamura, Motohide; Traub, Wesley A.; Mawet, Dimitri; Moody, Dwight C.; Kern, Brian D.; Trauger, John T.; Serabyn, Eugene; Hamaguchi, Shoki; Oshiyama, Fumika

    2012-01-01

    Photonic crystal, an artificial periodic nanostructure of refractive indices, is one of the attractive technologies for coronagraph focal-plane masks aiming at direct imaging and characterization of terrestrial extrasolar planets. We manufactured the eight-octant phase mask (8OPM) and the vector vortex mask (VVM) very precisely using the photonic crystal technology. Fully achromatic phase-mask coronagraphs can be realized by applying appropriate polarization filters to the masks. We carried out laboratory experiments of the polarization-filtered 8OPM coronagraph using the High-Contrast Imaging Testbed (HCIT), a state-of-the-art coronagraph simulator at the Jet Propulsion Laboratory (JPL). We report the experimental results of 10-8-level contrast across several wavelengths over 10% bandwidth around 800nm. In addition, we present future prospects and observational strategy for the photonic-crystal mask coronagraphs combined with differential imaging techniques to reach higher contrast. We proposed to apply a polarization-differential imaging (PDI) technique to the VVM coronagraph, in which we built a two-channel coronagraph using polarizing beam splitters to avoid a loss of intensity due to the polarization filters. We also proposed to apply an angular-differential imaging (ADI) technique to the 8OPM coronagraph. The 8OPM/ADI mode avoids an intensity loss due to a phase transition of the mask and provides a full field of view around central stars. We present results of preliminary laboratory demonstrations of the PDI and ADI observational modes with the phase-mask coronagraphs.

  4. Modelling binaural processes involved in simultaneous reflection masking: limitations of current models

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2007-01-01

    Masked thresholds were measured for a single test reflection, masked by the direct sound, as a function of the reflection delay. This was done for diotic as well as for dichotic stimulus presentations and all stimuli were presented via headphones. The input signal was a 200-ms long broadband nois...

  5. Oxygen mask fit analysis in F-16 fighter pilots using 3D imaging

    NARCIS (Netherlands)

    Schreinemakers, J.R.C.; Oudenhuijzen, A.J.K.; Amerongen, P.C.G.M. van; Kon, M.

    2013-01-01

    Background: The majority of Dutch F-16 pilots experience in-flight oxygen mask related nasal discomfort and injury. We aimed to analyze the fit of the oxygen mask. Methods: We successfully scanned 35 pilots with a 3D scanner to measure the distance between the contact area on the nose and the oxygen

  6. Improving light harvesting in polymer photodetector devices through nanoindented metal mask films

    NARCIS (Netherlands)

    Macedo, A. G.; Zanetti, F.; Mikowski, A.; Hummelen, J. C.; Lepienski, C. M.; da Luz, M. G. E.; Roman, L. S.

    2008-01-01

    To enhance light harvesting in organic photovoltaic devices, we propose the incorporation of a metal (aluminum) mask film in the system's usual layout. We fabricate devices in a sandwich geometry, where the mask (nanoindented with a periodic array of holes of sizes d and spacing s) is added between

  7. Masking Release in Children and Adults with Hearing Loss When Using Amplification

    Science.gov (United States)

    Brennan, Marc; McCreery, Ryan; Kopun, Judy; Lewis, Dawna; Alexander, Joshua; Stelmachowicz, Patricia

    2016-01-01

    Purpose: This study compared masking release for adults and children with normal hearing and hearing loss. For the participants with hearing loss, masking release using simulated hearing aid amplification with 2 different compression speeds (slow, fast) was compared. Method: Sentence recognition in unmodulated noise was compared with recognition…

  8. Inferior alveolar nerve injury with laryngeal mask airway: a case report.

    LENUS (Irish Health Repository)

    Hanumanthaiah, Deepak

    2011-01-01

    The incidence of damage to the individual cranial nerves and their branches associated with laryngeal mask airway use is low; there have been case reports of damage to the lingual nerve, hypoglossal nerve and recurrent laryngeal nerve. To the best of our knowledge we present the first reported case of inferior alveolar nerve injury associated with laryngeal mask airway use.

  9. E-beam data compaction method for large-capacity mask ROM production

    Science.gov (United States)

    Kanemaru, Toyomi; Nakajima, Takashi; Igarashi, Tadanao; Masuda, Rika; Orita, Nobuyuki

    1991-03-01

    Mask ROMs are one of the most advanced devices commercially available today. 4 Mbit DRAMs are just coming to the market, where 32 Mbit and 64 Mbit Mask ROM products also are entering the market. The code mask of Mask ROM consists, of a random distribution of repeated cells on a constant grid, so it is difficult to use conventional e-beam data compaction techniques for the code mask level of a Mask ROM. As mask ROM capacity and their mask exposure data volumes increase, the e-beam data processing time for these devices also has increased even with enhanced computational speeds of new mainframe computers. To overcome this problem, we have adopted a new e-beam data compaction technique. With this ne technique of a data compaction, data conversion times on a mainframe computer (ACOS) are substantially shorted and data volume is reduced by as much as a factor of one hundred. Using this new data format, the data volume of a variable shaped vector scan e-beam exposure system became far smaller compared with a spot beam raster scan e-beam system.

  10. Epidemiology of masked and white-coat hypertension: the family-based SKIPOGH study

    OpenAIRE

    Heba Alwan; Menno Pruijm; Belen Ponte; Daniel Ackermann; Idris Guessous; Georg Ehret; Staessen, Jan A; Kei Asayama; Philippe Vuistiner; Sandrine Estoppey Younes; Fred Paccaud; Grégoire Wuerzner; Antoinette Pechere-Bertschi; Markus Mohaupt; Bruno Vogt

    2014-01-01

    OBJECTIVE: We investigated factors associated with masked and white-coat hypertension in a Swiss population-based sample. METHODS: The Swiss Kidney Project on Genes in Hypertension is a family-based cross-sectional study. Office and 24-hour ambulatory blood pressure were measured using validated devices. Masked hypertension was defined as office blood pressure

  11. An empirical approach adressing the transfer of mask placement errors during exposure

    Science.gov (United States)

    Alles, B.; Simeon, B.; Cotte, E.; Wandel, T.; Schulz, B.; Seltmann, R.

    2007-02-01

    Today's semiconductors consist of up to forty structured layers which make up the electric circuit. Since the market demands more powerful chips at minimal cost, the structure size is decreased with every technology node. The smaller the features become, the more sensitive is the functional effciency of the chip with respect to placement errors. One crucial component for placement errors is the mask which can be viewed as a blueprint of the layer's structures. Hence, placement accuracy requirements for masks are also tightening rapidly. These days, mask shops strive for improving their positioning performance. However, more and more effort is required which will increase the costs for masks. Therefore, the transfer of mask placement errors onto the wafer is analyzed in order to check the guidelines which are used for deriving placement error specifications. In the first section of this paper the basic concepts for measuring placement errors are provided. Then, a method is proposed which is able to characterize the transfer of placement errors from mask to wafer. This is followed by two sections giving a thorough statistical analysis of this method. In the fifth section, the connection to placement accuracy specifications on mask and wafer is established. Finally, the method is applied to a set of test masks provided by AMTC and printed by AMD.

  12. Tuning the cognitive environment: Sound masking with 'natural' sounds in open-plan offices

    Science.gov (United States)

    DeLoach, Alana

    With the gain in popularity of open-plan office design and the engineering efforts to achieve acoustical comfort for building occupants, a majority of workers still report dissatisfaction in their workplace environment. Office acoustics influence organizational effectiveness, efficiency, and satisfaction through meeting appropriate requirements for speech privacy and ambient sound levels. Implementing a sound masking system is one tried-and-true method of achieving privacy goals. Although each sound masking system is tuned for its specific environment, the signal -- random steady state electronic noise, has remained the same for decades. This research work explores how `natural' sounds may be used as an alternative to this standard masking signal employed so ubiquitously in sound masking systems in the contemporary office environment. As an unobtrusive background sound, possessing the appropriate spectral characteristics, this proposed use of `natural' sounds for masking challenges the convention that masking sounds should be as meaningless as possible. Through the pilot study presented in this work, we hypothesize that `natural' sounds as sound maskers will be as effective at masking distracting background noise as the conventional masking sound, will enhance cognitive functioning, and increase participant (worker) satisfaction.

  13. Pixel-based ant colony algorithm for source mask optimization

    Science.gov (United States)

    Kuo, Hung-Fei; Wu, Wei-Chen; Li, Frederick

    2015-03-01

    Source mask optimization (SMO) was considered to be one of the key resolution enhancement techniques for node technology below 20 nm prior to the availability of extreme-ultraviolet tools. SMO has been shown to enlarge the process margins for the critical layer in SRAM and memory cells. In this study, a new illumination shape optimization approach was developed on the basis of the ant colony optimization (ACO) principle. The use of this heuristic pixel-based ACO method in the SMO process provides an advantage over the extant SMO method because of the gradient of the cost function associated with the rapid and stable searching capability of the proposed method. This study was conducted to provide lithographic engineers with references for the quick determination of the optimal illumination shape for complex mask patterns. The test pattern used in this study was a contact layer for SRAM design, with a critical dimension and a minimum pitch of 55 and 110 nm, respectively. The optimized freeform source shape obtained using the ACO method was numerically verified by performing an aerial image investigation, and the result showed that the optimized freeform source shape generated an aerial image profile different from the nominal image profile and with an overall error rate of 9.64%. Furthermore, the overall average critical shape difference was determined to be 1.41, which was lower than that for the other off-axis illumination exposure. The process window results showed an improvement in exposure latitude (EL) and depth of focus (DOF) for the ACO-based freeform source shape compared with those of the Quasar source shape. The maximum EL of the ACO-based freeform source shape reached 7.4% and the DOF was 56 nm at an EL of 5%.

  14. TASTE MASKING AND FORMULATION OF ONDANSETRON HYDROCHLORIDE MOUTH DISSOLVING TABLETS

    Directory of Open Access Journals (Sweden)

    Shyam Raj Subedi, Bhupendra Kumar Poudel

    2015-05-01

    Full Text Available This study was done to mask the bitter taste of ondansetron HCl using complexing agent, a polacrilex resin: Tulsion 335 and subsequently forming mouth dissolving tablet using superdisintegrants: Croscarmellose sodium and sodium starch glycollate. A preliminary screening was done. Batch process, a most preferential method for drug loading with ion exchange resins was selected. The process was optimized for drug: resin ratio to get maximum drug loading. A ratio of drug: resin at 1:3 was selected. Taste evaluation was carried out by selecting volunteers. Drug resin complex (DRC was evaluated for drug release. The resultant DRC was formulated by direct compression into mouth dissolving tablet using microcrystalline cellulose PH 102, as diluent and croscarmalose sodium and sodium starch glycolate as superdisintegrants and aspartame was used as sweetening agent to enhance palatability. Thirteen formulations were developed by using superdisintegrants: croscarmellose sodium and sodium starch glycolate. Concentration of superdisintegrants ranged from 0.75-9.24 %. The formulated tablet had satisfactory disintegration time and dissolution profile. Optimization was carried out using central composite design. The disintegration and dissolution times were tallied with marketed ondansetron HCl tablets. From the results, it was deduced that the most effective concentration for desired disintegration was of croscarmellose sodium and sodium starch glycollate respectively at concentration above 5%. Therefore, it can be concluded that the intensely bitter taste of ondansetron HCl can be masked by using tulsion 335 and mouth dissolving ondansetron HCl can be successfully prepared by adding aforementioned superdisintegrants. This sort of mouth dissolving ondansetron HCl can be used in controlling vomiting in paediatric and geriatric patients and also for pregnancy induced vomiting.

  15. Current approach to masked hypertension: From diagnosis to clinical management.

    LENUS (Irish Health Repository)

    Dolan, Eamon

    2013-11-28

    The term masked hypertension phenomenon was first described by the late Professor Thomas Pickering and is commonly defined as having a normal clinic blood pressure (BP) but an elevated "out of office" reading. In the main these elevated readings have been provided through ambulatory blood pressure monitoring (ABPM) but sometimes home BP monitoring is used. It is now largely accepted that ABPM gives a better classification of risk than clinic BP. Thus the elevated ABPM levels should relate to higher cardiovascular risk and it follows that these people might be regarded as being genuinely hypertensive and at higher cardiovascular risk. The problem for clinical practice is how to identify and manage these subjects. The phenomenon should be suspected in subjects who have had an elevated clinic BP at some time, in young subjects with normal or normal-high clinic BP who have early left ventricular hypertrophy, in subjects with a family history of hypertension in both parents, patients with multiple risks for cardiovascular disease and perhaps diabetic patients. It appears to be more prevalent in subjects of male gender, with younger age, higher heart rate, obesity or high cholesterol levels and in smokers. Those with masked hypertension are at higher risk of events such as stroke and have a higher prevalence of target organ damage, for example, nephropathy. In conclusion most of the debate around this topic relates to its reliable identification. Given the higher ambulatory readings there is an increases cardiovascular risk making this diagnosis important. This article is protected by copyright. All rights reserved.

  16. A new MOS mask cutter facility at Gemini/Cerro Tololo observatories

    Science.gov (United States)

    Wyman, Robert T.; Trancho, Gelys; Tighe, Roberto

    2010-07-01

    The installation and commissioning of a new laser cutter facility in La Serena, Chile is a cooperative effort between Gemini Observatory and the Cerro Tololo Inter-American Observatory. This system enables the cutting of aluminum and carbon fiber slit masks for three multi-object spectrographs operating in Chile: GMOS-S, Flamingos-2, and Goodman spectrograph. Selection of the new laser cutter tool was based on slit mask specifications developed for two materials. Prior to the commissioning all slit mask production was performed at Gemini's Northern base facility with a similar laser cutter system. The new facility supports two observatories and enhances the capabilities for both. This paper will discuss the observatory arrangement with respect to mask data tracking and handling. The laser system and facility will be discussed along with mask cutting performance, process development and manufacturing methods.

  17. Evaluation of different strategies to mask boar taint in cooked sausage.

    Science.gov (United States)

    Martínez, B; Rubio, B; Viera, C; Linares, M B; Egea, M; Panella-Riera, N; Garrido, M D

    2016-06-01

    The use of smoking and/or spices was evaluated for their ability to mask boar taint in frankfurters manufactured from entire pigs with high levels of androstenone. Five frankfurter types were considered: control, smoked, flavouring+smoked, spicy and spicy+smoked. A trained panel in androstenone perception carried out a sensory profile on the different sausages. The highest scores for androstenone perception (odour, flavour and aftertaste) were found in frankfurters that included no masking strategy which indicated the effectiveness of the evaluated strategies. Regarding masking strategies, the contribution of spices and smoking to sensory perception of frankfurters was detected by the panellists. Smoking was the best strategy to mask androstenone odour, while the use of spices masked androstenone odour to a greater extent than androstenone flavour. Only the combined use of spices and smoking was able to eliminate the perception of androstenone. The application of this strategy in frankfurters could be an alternative in the commercialization of entire pigs. PMID:26844925

  18. To enhance imaging performance of hybrid imaging systems by using two asymmetrical phase masks.

    Science.gov (United States)

    Le, Van Nhu; Chen, Shouqian; Fan, Zhigang; Pham, Nghia Minh

    2016-02-10

    We propose the use of two asymmetrical phase masks combined with the subtracted imaging method to enhance the signal-to-noise ratio in wavefront coding systems. This subtracted imaging technique is similar to the variable pinhole diameter in confocal microscopy. Two different phase modulations of same phase masks are employed to promote the magnitude of the optical transfer function (OTF). The ratio factor is used to control the phase variation between two phase masks. The noise of decoded images is suppressed owing to the higher magnitude of the OTF than the wavefront coding systems with a phase mask. A tangent phase mask as an example is used to demonstrate our concept. Simulated results show that the performance promotion controls noise amplification of decoded images while maintaining a depth-of-field extension. PMID:26906377

  19. Evaluation of different strategies to mask boar taint in cooked sausage.

    Science.gov (United States)

    Martínez, B; Rubio, B; Viera, C; Linares, M B; Egea, M; Panella-Riera, N; Garrido, M D

    2016-06-01

    The use of smoking and/or spices was evaluated for their ability to mask boar taint in frankfurters manufactured from entire pigs with high levels of androstenone. Five frankfurter types were considered: control, smoked, flavouring+smoked, spicy and spicy+smoked. A trained panel in androstenone perception carried out a sensory profile on the different sausages. The highest scores for androstenone perception (odour, flavour and aftertaste) were found in frankfurters that included no masking strategy which indicated the effectiveness of the evaluated strategies. Regarding masking strategies, the contribution of spices and smoking to sensory perception of frankfurters was detected by the panellists. Smoking was the best strategy to mask androstenone odour, while the use of spices masked androstenone odour to a greater extent than androstenone flavour. Only the combined use of spices and smoking was able to eliminate the perception of androstenone. The application of this strategy in frankfurters could be an alternative in the commercialization of entire pigs.

  20. Coherent scattering microscopy as an effective inspection tool for analyzing performance of phase shift mask.

    Science.gov (United States)

    Woo, Dong Gon; Lee, Jae Uk; Hong, Seong Chul; Kim, Jung Sik; Ahn, Jinho

    2016-05-30

    The imaging performance of a half-tone phase shift mask (PSM) has been analyzed using coherent scattering microscopy (CSM), which allows analysis of the actinic characteristics of an extreme ultraviolet (EUV) mask such as its reflectivity, diffraction efficiency, and phase information. This paper presents the 1st experimental result showing the effect of 180° phase difference between the absorber and reflector in EUV mask. This reveals that a PSM offers a 46% improvement in 1st/0th diffraction efficiency and 14% improvement in image contrast when compared to a binary intensity mask (BIM). The horizontal-vertical critical dimension (H-V CD) bias is also reduced by 1.37 nm at 22 nm line and space (L/S) patterns. Since the performance of PSM can be evaluated without a wafer patterning process, CSM is expected to be a useful inspection tool for the development of novel EUV masks. PMID:27410126

  1. Investigation of Mask Inclination Due to Oxygen-Radical Irradiation during Resist Trimming

    Science.gov (United States)

    Kofuji, Naoyuki; Miura, Hideo

    2010-08-01

    A novel analytical method for predicting the inclination of a resist mask during its trimming process has been proposed by considering the formation of the surface degraded layer with high compressive stress. It was found that the irradiation of oxygen radicals creates a degraded layer on the resist surface and causes high compressive stress in it. A nonuniform spatial distribution of oxygen radicals, therefore, causes an asymmetrical stress field on the resist-mask surface. Such an asymmetrical stress field distorts the resist mask. The well-known Deal-Grove's oxidation model was modified for the trimming process by considering the time-dependent change of the spatial distribution of oxygen radicals on the mask surface. This model successfully explains the observed complicated time-dependent deformation of the resist mask.

  2. Exhaled air dispersion during coughing with and without wearing a surgical or N95 mask.

    Directory of Open Access Journals (Sweden)

    David S Hui

    Full Text Available OBJECTIVES: We compared the expelled air dispersion distances during coughing from a human patient simulator (HPS lying at 45° with and without wearing a surgical mask or N95 mask in a negative pressure isolation room. METHODS: Airflow was marked with intrapulmonary smoke. Coughing bouts were generated by short bursts of oxygen flow at 650, 320, and 220L/min to simulate normal, mild and poor coughing efforts, respectively. The coughing jet was revealed by laser light-sheet and images were captured by high definition video. Smoke concentration in the plume was estimated from the light scattered by smoke particles. Significant exposure was arbitrarily defined where there was ≥ 20% of normalized smoke concentration. RESULTS: During normal cough, expelled air dispersion distances were 68, 30 and 15 cm along the median sagittal plane when the HPS wore no mask, a surgical mask and a N95 mask, respectively. In moderate lung injury, the corresponding air dispersion distances for mild coughing efforts were reduced to 55, 27 and 14 cm, respectively, p < 0.001. The distances were reduced to 30, 24 and 12 cm, respectively during poor coughing effort as in severe lung injury. Lateral dispersion distances during normal cough were 0, 28 and 15 cm when the HPS wore no mask, a surgical mask and a N95 mask, respectively. CONCLUSIONS: Normal cough produced a turbulent jet about 0.7 m towards the end of the bed from the recumbent subject. N95 mask was more effective than surgical mask in preventing expelled air leakage during coughing but there was still significant sideway leakage.

  3. The mysterious noh mask: contribution of multiple facial parts to the recognition of emotional expressions.

    Directory of Open Access Journals (Sweden)

    Hiromitsu Miyata

    Full Text Available BACKGROUND: A Noh mask worn by expert actors when performing on a Japanese traditional Noh drama is suggested to convey countless different facial expressions according to different angles of head/body orientation. The present study addressed the question of how different facial parts of a Noh mask, including the eyebrows, the eyes, and the mouth, may contribute to different emotional expressions. Both experimental situations of active creation and passive recognition of emotional facial expressions were introduced. METHODOLOGY/PRINCIPAL FINDINGS: In Experiment 1, participants either created happy or sad facial expressions, or imitated a face that looked up or down, by actively changing each facial part of a Noh mask image presented on a computer screen. For an upward tilted mask, the eyebrows and the mouth shared common features with sad expressions, whereas the eyes with happy expressions. This contingency tended to be reversed for a downward tilted mask. Experiment 2 further examined which facial parts of a Noh mask are crucial in determining emotional expressions. Participants were exposed to the synthesized Noh mask images with different facial parts expressing different emotions. Results clearly revealed that participants primarily used the shape of the mouth in judging emotions. The facial images having the mouth of an upward/downward tilted Noh mask strongly tended to be evaluated as sad/happy, respectively. CONCLUSIONS/SIGNIFICANCE: The results suggest that Noh masks express chimeric emotional patterns, with different facial parts conveying different emotions This appears consistent with the principles of Noh which highly appreciate subtle and composite emotional expressions, as well as with the mysterious facial expressions observed in Western art. It was further demonstrated that the mouth serves as a diagnostic feature in characterizing the emotional expressions. This indicates the superiority of biologically-driven factors over the

  4. A novel anti-influenza copper oxide containing respiratory face mask.

    Directory of Open Access Journals (Sweden)

    Gadi Borkow

    Full Text Available BACKGROUND: Protective respiratory face masks protect the nose and mouth of the wearer from vapor drops carrying viruses or other infectious pathogens. However, incorrect use and disposal may actually increase the risk of pathogen transmission, rather than reduce it, especially when masks are used by non-professionals such as the lay public. Copper oxide displays potent antiviral properties. A platform technology has been developed that permanently introduces copper oxide into polymeric materials, conferring them with potent biocidal properties. METHODOLOGY/PRINCIPAL FINDINGS: We demonstrate that impregnation of copper oxide into respiratory protective face masks endows them with potent biocidal properties in addition to their inherent filtration properties. Both control and copper oxide impregnated masks filtered above 99.85% of aerosolized viruses when challenged with 5.66+/-0.51 and 6.17+/-0.37 log(10TCID(50 of human influenza A virus (H1N1 and avian influenza virus (H9N2, respectively, under simulated breathing conditions (28.3 L/min. Importantly, no infectious human influenza A viral titers were recovered from the copper oxide containing masks within 30 minutes (< or = 0.88 log(10TCID(50, while 4.67+/-1.35 log(10TCID(50 were recovered from the control masks. Similarly, the infectious avian influenza titers recovered from the copper oxide containing masks were < or = 0.97+/-0.01 log(10TCID(50 and from the control masks 5.03+/-0.54 log(10TCID(50. The copper oxide containing masks successfully passed Bacterial Filtration Efficacy, Differential Pressure, Latex Particle Challenge, and Resistance to Penetration by Synthetic Blood tests designed to test the filtration properties of face masks in accordance with the European EN 14683:2005 and NIOSH N95 standards. CONCLUSIONS/SIGNIFICANCE: Impregnation of copper oxide into respiratory protective face masks endows them with potent anti-influenza biocidal properties without altering their physical

  5. Rapid enzymatic hydrolysis of masked deoxynivalenol and zearalenone prior to liquid chromatography mass spectrometry or immuniassay analysis

    NARCIS (Netherlands)

    Nielen, M.W.F.; Weijers, C.A.G.M.; Peters, J.; Weignerová, L.; Zuilhof, H.; Franssen, M.C.R.

    2014-01-01

    Recently it has been shown that conjugates (‘masked mycotoxins’) may contribute to the total daily intake of hazardous mycotoxins. Therefore, there is an urgent need for rapid analysis methods that assess the level of both free and masked mycotoxins in food and feed. However, the analysis of masked

  6. Affect Regulation

    DEFF Research Database (Denmark)

    Pedersen, Signe Holm; Poulsen, Stig Bernt; Lunn, Susanne

    2014-01-01

    Gergely and colleagues’ state that their Social Biofeedback Theory of Parental Affect Mirroring” can be seen as a kind of operationalization of the classical psychoanalytic concepts of holding, containing and mirroring. This article examines to what extent the social biofeedback theory of parenta...

  7. Practitioners' impressions of patients with Parkinson's disease: the social ecology of the expressive mask.

    Science.gov (United States)

    Tickle-Degnen, Linda; Lyons, Kathleen Doyle

    2004-02-01

    The expressive mask of Parkinson's disease, a reduced spontaneity, intensity, and fluidity of facial, bodily, and vocal expression, jeopardizes interpersonal interaction and quality of life. Observers have difficulty perceiving the "real" person behind the mask, leading to failed communication and misunderstanding. A social ecological explanation of this difficulty is that observers have learned in their daily social lives, and quite appropriately so, that expressive behavior reveals meaningful information about character. The premise of this study was that health practitioners, especially novices, would bring into the clinic their everyday perceptual tendencies related to deciphering character. The study examined novice and expert practitioners' impressions of the personality of patients with Parkinson's disease who were videotaped during a healthcare interview. It was found that practitioners, especially novices, appeared to be overly sensitive to expressive masking when forming impressions about patient extraversion. They incorrectly perceived patients with more masking to be less extraverted than patients with less masking. Novice practitioners were particularly inaccurate in their impressions of neuroticism compared to experts. Novices incorrectly perceived patients with more masking as being more neurotic, whereas experts tended to be sensitive to valid cues of neuroticism. Practitioners' impressions of patient conscientiousness were not sensitive to masking and were highly accurate.

  8. LithoScope: Simulation Based Mask Layout Verification with Physical Resist Model

    Science.gov (United States)

    Qian, Qi-De

    2002-12-01

    Simulation based mask layout verification and optimization is a cost effective way to ensure high mask performance in wafer lithography. Because mask layout verification serves as a gateway to the expensive manufacturing process, the model used for verification must have superior accuracy than models used upstream. In this paper, we demonstrate, for the first time, a software system for mask layout verification and optical proximity correction that employs a physical resist development model. The new system, LithoScope, predicts wafer patterning by solving optical and resist processing equations on a scale that is until recently considered unpractical. Leveraging the predictive capability of the physical model, LithoScope can perform mask layout verification and optical proximity correction under a wide range of processing conditions and for any reticle enhancement technology without the need for multiple model development. We show the ability for physical resist model to change iso-focal bias by optimizing resist parameters, which is critical for matching the experimental process window. We present line width variation statistics and chip level process window predictions using a practical cell layout. We show that LithoScope model can accurately describe the resist-intensive poly gate layer patterning. This system can be used to pre-screen mask data problems before manufacturing to reduce the overall cost of the mask and the product.

  9. Practitioners' impressions of patients with Parkinson's disease: the social ecology of the expressive mask.

    Science.gov (United States)

    Tickle-Degnen, Linda; Lyons, Kathleen Doyle

    2004-02-01

    The expressive mask of Parkinson's disease, a reduced spontaneity, intensity, and fluidity of facial, bodily, and vocal expression, jeopardizes interpersonal interaction and quality of life. Observers have difficulty perceiving the "real" person behind the mask, leading to failed communication and misunderstanding. A social ecological explanation of this difficulty is that observers have learned in their daily social lives, and quite appropriately so, that expressive behavior reveals meaningful information about character. The premise of this study was that health practitioners, especially novices, would bring into the clinic their everyday perceptual tendencies related to deciphering character. The study examined novice and expert practitioners' impressions of the personality of patients with Parkinson's disease who were videotaped during a healthcare interview. It was found that practitioners, especially novices, appeared to be overly sensitive to expressive masking when forming impressions about patient extraversion. They incorrectly perceived patients with more masking to be less extraverted than patients with less masking. Novice practitioners were particularly inaccurate in their impressions of neuroticism compared to experts. Novices incorrectly perceived patients with more masking as being more neurotic, whereas experts tended to be sensitive to valid cues of neuroticism. Practitioners' impressions of patient conscientiousness were not sensitive to masking and were highly accurate. PMID:14652056

  10. THE RATE AND CHARACTERS OF MASKED ARTERIAL HYPERTENSION AND MASKED INEFFECTIVENESS OF HYPERTENSION TREATMENT IN INDUSTRIAL WORKERS ACCORDING TO THE PREVENTIVE EXAMINATION

    Directory of Open Access Journals (Sweden)

    M. I. Smirnova

    2015-09-01

    Full Text Available Aim. To study the rate and characters of masked arterial hypertension (HT and masked ineffectiveness of HT treatment in industrial workers within annual preventive examination.Material and methods. Workers (n=185 with normal office blood pressure (BP <140 and <90 mm Hg were enrolled into cross-cohort study of industrial workers of large enterprise engaged in activity with harmful and/or dangerous conditions (n=477; mean age 53.2±5.5 years. Standard survey, anthropometry, ambulatory BP monitoring (ABPM, blood chemistry, electrocardiography, and echocardiography were performed. Criteria of masked HT and masked HT in treated subjects were the level of office BP <140 and <90 mm Hg in combination with mean BP during the operational period ≥135 and/or ≥85 mmHg. Patient characters significantly associated with this ratio of office BP and BP during the operational period were considered as features of isolated increase in ambulatory BP level.Results. The rate of masked HT among workers with normal office BP was 10.8%, and masked HT among treated subjects was 34.6%. Workers with masked HT, in contrast to the normotensive workers according to the office BP and ABPM measurements, had a higher left ventricular mass index (in males 129.0±21.2 vs. 109.5±28.8 g/m2, respectively, in women 105.2±43.2 vs. 82.4±25.3 g/m2, respectively, p<0.05, and higher body weight (85.4±13.3 vs. 81.3±10.1 kg, respectively; p=0.05. Treated subjects with masked HT, unlike workers with effective antihypertensive therapy had a higher body weight (89.4±16.1 vs. 85.4±15.8 kg, respectively, p<0.05, higher levels of triglycerides (1.56±0.95 vs. 1.23±0.55 mmol/l, respectively, p<0.01 and uric acid (388.5±89.5 vs. 357.2±84.5 mmol/l, respectively, p<0.05, more prominent left ventricular hypertrophy, lower incidence of ischemic heart disease, but higher number of persons taking ACE inhibitors. Occupation and work features were not characters of the masked HT and masked

  11. Formulation and Evaluation of taste masked oral suspension of Dextromethorphan Hydrobromide

    Directory of Open Access Journals (Sweden)

    Shaikh Sana

    2012-06-01

    Full Text Available Taste is an important factor in the development of dosage form. The problem of bitter and obnoxious taste of drug in pediatric and geriatric formulations is a challenge to the pharmacist in the present scenario. In order to ensure patient compliance bitterness masking becomes essential. The purpose of this research was to mask the intensely bitter taste of Dextromethorphan Hydrobromide using ion exchange resin and to formulate oral suspension of the taste masked drug. When suspension is swallowed bitter taste may not be felt because ion exchange resin complex does not release drug at salivary pH. When it comes in contact with acidic environment of stomach, the complex will be broken down releasing the drug which may then absorbed. Batch method was used for formation of drug resin complex. Various ion exchange resins such as Ionex QM 1011, Ionex WC 23 and Kyron T- 114 were tried to obtained taste masked drug resin complex (DRC. Optimization of drug loading was carried out. With Ionex QM 1011, the drug-resin proportion of 1:6 achieved equilibrium in 6 hours. 96% w/w of drug loading was possible by this method. Complex formation was confirmed by DSC and IR studies. Oral taste masked suspension was prepared using xanthum gum and tween 80 and was evaluated with respect to parameters such as Colour, pH, Viscosity, Sedimentation volume, Redispersibility, Assay, drug release. Taste masking was evaluated with the help of panel of human volunteers and Rat Behavioral Avoidance Taste Model. Taste masked suspension showed easy redispersibility and more than 99.6 % of the drug release within 45 minutes at pH 1.2. Thus, results conclusively demonstrated successful taste masking and formulation of suspension with taste masked drug especially for pediatric, geriatric, bedridden, and non cooperative patients.

  12. Mask CD uniformity metrology for logic patterning and its correlation to wafer data

    Science.gov (United States)

    Le Gratiet, Bertrand; Zékri, Raphaël.; Sundermann, Frank; Trautzsch, Thomas; Thaler, Thomas; Birkner, Robert; Buttgereit, Ute

    2012-06-01

    With the next technology nodes 193nm lithography is pushed to its utmost limits. The industry is forced to print at low k1 factor which goes along with a high MEEF. Additionally, new blank materials are being introduced for smaller nodes. From 4x node and beyond, global CD uniformity on wafer is getting more critical and becomes key factor to ensure a high yield in chip production. Advanced process control is required and correction strategies are applied to maintain tight wafer CD uniformity. Beside other parameters, like scanner and etch process, mask CD uniformity is one main contributor to the intra-field CD on wafer. To enable effective CDU correction strategies it is necessary to establish a mask CD uniformity metrology which shows a good correlation to wafer prints. Especially for logic pattern mask uniformity measurements to control intra-field CD uniformity becomes challenging. In this paper we will focus on mask CD uniformity measurement for logic application utilizing WLCD, which is based on aerial image technology. We will investigate 40nm node and 28nm node gate masks using 6% MoSi phase shifting mask and MoSi binary mask respectively. Furthermore, we will correlate the mask CD uniformity data to wafer data to evaluate the capability of WLCD to predict the intra-field wafer CD uniformity correctly in order to support feedforward correction strategies. We will show that WLCD shows an excellent correlation to wafer data. Additionally, we will provide an outlook on logic contact-hole masks showing first CD uniformity data and wafer correlation data.

  13. New method of detection and classification of yield-impacting EUV mask defects

    Science.gov (United States)

    Graur, Ioana; Vengertsev, Dmitry; Raghunathan, Ananthan; Stobert, Ian; Rankin, Jed

    2015-10-01

    Extreme ultraviolet lithography (EUV) advances printability of small size features for both memory and logic semiconductor devices. It promises to bring relief to the semiconductor manufacturing industry, removing the need for multiple masks in rendering a single design layer on wafer. However, EUV also brings new challenges, one of which is of mask defectivity. For this purpose, much of the focus in recent years has been in finding ways to adequately detect, characterize, and reduce defects on both EUV blanks and patterned masks. In this paper we will present an efficient way to classify and disposition EUV mask defects through a new algorithm developed to classify defects located on EUV photomasks. By processing scanning electronmicroscopy images (SEM) of small regions of a photomask, we extract highdimensional local features Histograms of Oriented Gradients (HOG). Local features represent image contents compactly for detection or classification, without requiring image segmentation. Using these HOGs, a supervised classification method is applied which allows differentiating between nondefective and defective images. In the new approach we have developed a superior method of detection and classification of defects, using mask and supporting mask printed data from several metallization masks. We will demonstrate that use of the HOG method allows realtime identification of defects on EUV masks regardless of geometry or construct. The defects identified by this classifier are further divided into subclasses for mask defect disposition: foreign material, foreign material from previous step, and topological defects. The goal of disposition is to categorize on the images into subcategories and provide recommendation of prescriptive actions to avoid impact on the wafer yield.

  14. OPC mask simplification using over-designed timing slack of standard cells

    Science.gov (United States)

    Qu, Yifan; Heng, Chun Huat; Tay, Arthur; Lee, Tong Heng

    2013-05-01

    It is well known that VLSI circuits must be designed to sustain the variations in process, voltage, temperature, etc. As a result, standard cell libraries (collections of the basic circuit components) are usually designed with large margin (also known as "timing slack"). However, in circuit manufacturing, only part of the margin will be utilized. The knowledge of the rest of the margin (over-designed timing slack), armed with models that link between timing domain and shape domain, can help to reduce the complexity of mask patterns and manufacturing cost. This paper proposed a novel methodology to simplify mask patterns in optical proximity correction (OPC) by using extra margin in timing (over-designed timing slack). This methodology can be applied after a conventional OPC, and is compatible with the current application-specific integrated circuit (ASIC) design flow. This iterative method is applied to each occurrence of over-designed timing slack. The actual value of timing slack can be estimated from post-OPC simulation. A timing cost function is developed in this work to map timing slack in timing domain to mask patterns in shape domain. This enables us to adjust mask patterns selectively based on the outcome of the cost function. All related mask patterns with over-designed timing slack will be annotated and simplified using our proposed mask simplification algorithm, which is in fact to merge the nearby edge fragments on the mask patterns. Simulations are conducted on a standard cell library and a full chip design to validate this proposed approach. When compared to existing OPC methods without mask simplification in the literature, our approach achieved a 51% reduction in mask fragment count, and this directly leads to a large saving in lithography manufacturing cost. The result also shows that timing closure is ensured, though part of the timing slack has been sacrificed.

  15. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    KAUST Repository

    Fan, Yiqiang

    2013-12-16

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO2 laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.

  16. Laser micromachined wax-covered plastic paper as both sputter deposition shadow masks and deep-ultraviolet patterning masks for polymethylmethacrylate-based microfluidic systems

    Science.gov (United States)

    Fan, Yiqiang; Li, Huawei; Yi, Ying; Foulds, Ian G.

    2013-10-01

    We report a technically innovative method of fabricating masks for both deep-ultraviolet (UV) patterning and metal sputtering on polymethylmethacrylate (PMMA) for microfluidic systems. We used a CO laser system to cut the required patterns on wax-covered plastic paper; the laser-patterned wax paper will either work as a mask for deep-UV patterning or as a mask for metal sputtering. A microfluidic device was also fabricated to demonstrate the feasibility of this method. The device has two layers: the first layer is a 1-mm thick PMMA substrate that was patterned by deep-UV exposure to create microchannels. The mask used in this process was the laser-cut wax paper. The second layer, also a 1-mm thick PMMA layer, was gold sputtered with patterned wax paper as the shadow mask. These two pieces of PMMA were then bonded to form microchannels with exposed electrodes. This process is a simple and rapid method for creating integrated microfluidic systems that do not require cleanroom facilities.

  17. Improved mask-based CD uniformity for gridded-design-rule lithography

    Science.gov (United States)

    Faivishevsky, Lev; Khristo, Sergey; Sagiv, Amir; Mangan, Shmoolik

    2009-03-01

    The difficulties encountered during lithography of state-of-the-art 2D patterns are formidable, and originate from the fact that deep sub-wavelength features are being printed. This results in a practical limit of k1 >=0.4 as well as a multitude of complex restrictive design rules, in order to mitigate or minimize lithographic hot spots. An alternative approach, that is gradually attracting the lithographic community's attention, restricts the design of critical layers to straight, dense lines (a 1D grid), that can be relatively easily printed using current lithographic technology. This is then followed by subsequent, less critical trimming stages to obtain circuit functionality. Thus, the 1D gridded approach allows hotspot-free, proximity-effect free lithography of ultra low- k1 features. These advantages must be supported by a stable CD control mechanism. One of the overriding parameters impacting CDU performance is photo mask quality. Previous publications have demonstrated that IntenCDTM - a novel, mask-based CDU mapping technology running on Applied Materials' Aera2TM aerial imaging mask inspection tool - is ideally fit for detecting mask-based CDU issues in 1D (L&S) patterned masks for memory production. Owing to the aerial nature of image formation, IntenCD directly probes the CD as it is printed on the wafer. In this paper we suggest that IntenCD is naturally fit for detecting mask-based CDU issues in 1D GDR masks. We then study a novel method of recovering and quantifying the physical source of printed CDU, using a novel implementation of the IntenCD technology. We demonstrate that additional, simple measurements, which can be readily performed on board the Aera2TM platform with minimal throughput penalty, may complement IntenCD and allow a robust estimation of the specific nature and strength of mask error source, such as pattern width variation or phase variation, which leads to CDU issues on the printed wafer. We finally discuss the roles played by

  18. Fabrication and Characteristics of Free Standing Shaped Pupil Masks for TPF-Coronagraph

    Science.gov (United States)

    Balasubramanian, Kunjithapatham; Echternach, Pierre M.; Dickie, Matthew R.; Muller, Richard E.; White, Victor E.; Hoppe, Daniel J.; Shaklan, Stuart B.; Belikov, Ruslan; Kasdin, N. Jeremy; Vanderbei, Robert J.; Ceperley, Daniel; Neureuther, Andrew R.

    2006-01-01

    Direct imaging and characterization of exo-solar terrestrial planets require coronagraphic instruments capable of suppressing star light to 10-10. Pupil shaping masks have been proposed and designed1 at Princeton University to accomplish such a goal. Based on Princeton designs, free standing (without a substrate) silicon masks have been fabricated with lithographic and deep etching techniques. In this paper, we discuss the fabrication of such masks and present their physical and optical characteristics in relevance to their performance over the visible to near IR bandwidth.

  19. Masking technique for coating thickness control on large and strongly curved aspherical optics

    OpenAIRE

    Sassolas, B; Flaminio, R; FRANC, J; Michel, C; Michel, Christine; Montorio, J.-L.; Morgado, N.; Pinard, L.

    2009-01-01

    This paper discusses a method to control the coating thickness deposited onto large and strongly curved optics by ion beam sputtering. The technique uses an original design of the mask used to screen part of the sputtered materials. A first multi-element mask is calculated from the measured 2D coating thickness distribution. Then, by means of an iterative process the final mask is designed. By using such a technique, it has been possible to deposit layers of tantalum pentoxide having a high t...

  20. Masking technique for coating thickness control on large and strongly curved aspherical optics.

    Science.gov (United States)

    Sassolas, B; Flaminio, R; Franc, J; Michel, C; Montorio, J-L; Morgado, N; Pinard, L

    2009-07-01

    We discuss a method to control the coating thickness deposited onto large and strongly curved optics by ion beam sputtering. The technique uses an original design of the mask used to screen part of the sputtered materials. A first multielement mask is calculated from the measured two-dimensional coating thickness distribution. Then, by means of an iterative process, the final mask is designed. By using such a technique, it has been possible to deposit layers of tantalum pentoxide having a high thickness gradient onto a curved substrate 500 mm in diameter. Residual errors in the coating thickness profile are below 0.7%. PMID:19571934

  1. Method and apparatus for monitoring oxygen partial pressure in air masks

    Science.gov (United States)

    Kelly, Mark E. (Inventor); Pettit, Donald R. (Inventor)

    2006-01-01

    Method and apparatus are disclosed for monitoring an oxygen partial pressure in an air mask and providing a tactile warning to the user. The oxygen partial pressure in the air mask is detected using an electrochemical sensor, the output signal from which is provided to a comparator. The comparator compares the output signal with a preset reference value or range of values representing acceptable oxygen partial pressures. If the output signal is different than the reference value or outside the range of values, the air mask is vibrated by a vibrating motor to alert the user to a potentially hypoxic condition.

  2. Comparison of critical dimension measurements of a mask inspection system with a CD-SEM

    Science.gov (United States)

    Heumann, Jan P.; Ullrich, Albrecht; Utzny, Clemens S.; Meusemann, Stefan; Kromer, Frank; Whittey, John M.; Garcia, Edgardo; Wagner, Mark; Schmidt, Norbert J.

    2012-11-01

    Critical dimension uniformity (CDU) is an important parameter for photomask and wafer manufacturing. In order to reduce long-range CD variation, compensation techniques for mask writers and scanners have been developed. Both techniques require mask CD measurements with high spatial sampling. Scanning electron microscopes (SEMs), which provide CD measurements at very high precision, cannot in practice provide the required spatial sampling due to their low speed. In contrast mask inspection systems, some of which have the ability to perform optical CD measurements with very high sampling frequencies, are an interesting alternative. In this paper we evaluate the CDU measurement results with those of a CD-SEM.

  3. Reservoir computing with a slowly modulated mask signal for preprocessing using a mutually coupled optoelectronic system

    Science.gov (United States)

    Tezuka, Miwa; Kanno, Kazutaka; Bunsen, Masatoshi

    2016-08-01

    Reservoir computing is a machine-learning paradigm based on information processing in the human brain. We numerically demonstrate reservoir computing with a slowly modulated mask signal for preprocessing by using a mutually coupled optoelectronic system. The performance of our system is quantitatively evaluated by a chaotic time series prediction task. Our system can produce comparable performance with reservoir computing with a single feedback system and a fast modulated mask signal. We showed that it is possible to slow down the modulation speed of the mask signal by using the mutually coupled system in reservoir computing.

  4. Generation and detection of gigahertz surface acoustic waves using an elastomeric phase-shift mask

    Science.gov (United States)

    Li, Dongyao; Zhao, Peng; Zhao, Ji-Cheng; Cahill, David G.

    2013-10-01

    We describe a convenient approach for measuring the velocity vSAW of surface acoustic waves (SAWs) of the near-surface layer of a material through optical pump-probe measurements. The method has a lateral spatial resolution of elastomeric polydimethylsiloxane phase-shift mask which is fabricated using a commercially available Si grating as a mold. Time-domain electromagnetics calculations show, in agreement with experiment, that the efficiency of the phase-shift mask for generating and detecting SAWs decreases rapidly as the periodicity of the mask decreases below the optical wavelength. We validate the experimental approach using bulk and thin film samples with known elastic constants.

  5. Spatial mask filtering algorithm for partial discharge pulse extraction of large generators

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    A spatial mask filter algorithm (SMF) for partial discharge (PD) pulse extraction is proposed in this then direct multiplication of coefficients at two adjacent scales is used to detect singularity points of the signal tain the last spatial mask filter. By multiplication of wavelet coefficients with the final mask filter and wavelet reconstruction process, partial discharge pulses are extracted. The results of digital simulation and practical experiment show that this method is superior to traditional wavelet shrinkage method (TWS). This algorithm not only can increase the signal to noise ratio (SNR), but also can preserve the energy and pulse amplitude.

  6. Data-derived symbol synchronization of MASK and QASK signals. [for multilevel digital communication systems

    Science.gov (United States)

    Simon, M. K.

    1974-01-01

    Multilevel amplitude-shift-keying (MASK) and quadrature amplitude-shift-keying (QASK) as signaling techniques for multilevel digital communications systems, and the problem of providing symbol synchronization in the receivers of such systems are discussed. A technique is presented for extracting symbol sync from an MASK or QASK signal. The scheme is a generalization of the data transition tracking loop used in PSK systems. The performance of the loop was analyzed in terms of its mean-squared jitter and its effects on the data detection process in MASK and QASK systems.

  7. Application of U-fixed red wax mask in radiotherapy

    Institute of Scientific and Technical Information of China (English)

    Kejia Liu; Jing Song; Rui Song; Zhiyong Liu; Gang Ni; Wei Ge

    2014-01-01

    Objective:The aim of our study was to compared non-red wax compensator and adding red wax compensator in the treatment plans of the minimum dose, maximum dose, mean dose and target surface dose, and compare the dose volume histograms (DVH) parameters and isodose distributions of two plans. Methods:From January 2009 to December 2010, 8 patients with superficial head and neck cancer and without surgery treatment were col ected. They al confirmed by cancer center, Tianmen First People’s Hospital. Topslane WiMRT was used to design the treatment plan of non-red wax compensa-tor and adding red wax compensator, with 6 MV photons using three-dimensional conformal irradiation mode design, the prescription dose was 50 Gy/25 times. Results:Compared non-red wax compensator with adding red wax compensator, its target minimum dose (t=-3.157, P0.05) and mean dose (t=-9.914, P>0.05) were considered no significant dif erence. Conclusion:The use of U-shaped mask fixed red wax film production in conformal radiotherapy tissue compensator can significantly improve the surface dose and dose distribution superficial planning target volume.

  8. Beam halo imaging with a digital optical mask

    Science.gov (United States)

    Zhang, H. D.; Fiorito, R. B.; Shkvarunets, A. G.; Kishek, R. A.; Welsch, C. P.

    2012-07-01

    Beam halo is an important factor in any high intensity accelerator. It can cause difficulties in the control of the beam, emittance growth, particle loss, and even damage to the accelerator. It is therefore essential to understand the mechanisms of halo formation and its dynamics. Experimental measurement of the halo distribution is a fundamental tool for such studies. In this paper, we present a new high dynamic range, adaptive masking method to image beam halo, which uses a digital micromirror-array device. This method has been thoroughly tested in the laboratory using standard optical techniques, and with an actual beam produced by the University of Maryland Electron Ring (UMER). A high dynamic range (DR˜105) has been demonstrated with this new method at UMER and recent studies, with more intense beams, indicate that this DR can be exceeded by more than an order of magnitude. The method is flexible, easy to implement, low cost, and can be used at any accelerator or light source. We present the results of our measurements of the performance of the method and illustrative images of beam halos produced under various experimental conditions.

  9. Fixed mask assembly research for APS insertion devices

    International Nuclear Information System (INIS)

    The Fixed Mask Assembly (FMA) is the first component to interact with the photon beam. Two sets of a pair of FMA channels, vertically and horizontally disposed, contain the beam rather than define it. They are subject to very large heat fluxes during containment. In current practice, the FMA channels are made of heavy, seamless copper, have rectangular cross-sections, and are cooled internally with water. Channels are set at grazing angles ranging from 1 to 6 degrees with respect to the beam, depending on the type of insertion device. APS insertion devices will impose higher heat fluxes on FMAs. Therefore, a need exists to improve the FMA engineering, keeping in the mind the current design criteria and philosophy of FMAs. Preliminary analysis of current heat transfer practice indicates that the major resistance to heat transfer is on the coolant side. Therefore, FMA cooling would benefit from enhanced heat transfer on the coolant side. With this principle in mind, an experimental program has been undertaken to explore the feasibility of using high-performance copper tube configurations which are expected to yield heat transfer coefficients, ''h,'' in single phase flow systems 2 to 5(?) times higher than equivalent plain tubes. In this report, the experimental scope and a preliminary analysis of high-performance copper tube configurations are described

  10. Trait dominance promotes reflexive staring at masked angry body postures.

    Science.gov (United States)

    Hortensius, Ruud; van Honk, Jack; de Gelder, Beatrice; Terburg, David

    2014-01-01

    It has been shown that dominant individuals sustain eye-contact when non-consciously confronted with angry faces, suggesting reflexive mechanisms underlying dominance behaviors. However, dominance and submission can be conveyed and provoked by means of not only facial but also bodily features. So far few studies have investigated the interplay of body postures with personality traits and behavior, despite the biological relevance and ecological validity of these postures. Here we investigate whether non-conscious exposure to bodily expressions of anger evokes reflex-like dominance behavior. In an interactive eye-tracking experiment thirty-two participants completed three social dominance tasks with angry, happy and neutral facial, bodily and face and body compound expressions that were masked from consciousness. We confirmed our predictions of slower gaze-aversion from both non-conscious bodily and compound expressions of anger compared to happiness in high dominant individuals. Results from a follow-up experiment suggest that the dominance behavior triggered by exposure to bodily anger occurs with basic detection of the category, but not recognition of the emotional content. Together these results suggest that dominant staring behavior is reflexively driven by non-conscious perception of the emotional content and triggered by not only facial but also bodily expression of anger. PMID:25549321

  11. The Keck Aperture Masking Experiment: Dust Enshrouded Red Giants

    CERN Document Server

    Blasius, T D; Tuthill, P G; Danchi, W C; Anderson, M

    2012-01-01

    While the importance of dusty asymptotic giant branch (AGB) stars to galactic chemical enrichment is widely recognised, a sophisticated understanding of the dust formation and wind-driving mechanisms has proven elusive due in part to the difficulty in spatially-resolving the dust formation regions themselves. We have observed twenty dust-enshrouded AGB stars as part of the Keck Aperture Masking Experiment, resolving all of them in multiple near-infrared bands between 1.5 microns and 3.1 microns. We find 45% of the targets to show measurable elongations that, when correcting for the greater distances of the targets, would correspond to significantly asymmetric dust shells on par with the well-known cases of IRC+10216 or CIT6. Using radiative transfer models, we find the sublimation temperature of 1130 +- 90 K and 1170 +- 60 K for silicates and amorphous carbon respectively, both somewhat lower than expected from laboratory measurements and vastly below temperatures inferred from the inner edge of YSO disks. Th...

  12. Vowel perception by noise masked normal-hearing young adults

    Science.gov (United States)

    Richie, Carolyn; Kewley-Port, Diane; Coughlin, Maureen

    2005-08-01

    This study examined vowel perception by young normal-hearing (YNH) adults, in various listening conditions designed to simulate mild-to-moderate sloping sensorineural hearing loss. YNH listeners were individually age- and gender-matched to young hearing-impaired (YHI) listeners tested in a previous study [Richie et al., J. Acoust. Soc. Am. 114, 2923-2933 (2003)]. YNH listeners were tested in three conditions designed to create equal audibility with the YHI listeners; a low signal level with and without a simulated hearing loss, and a high signal level with a simulated hearing loss. Listeners discriminated changes in synthetic vowel tokens /smcapi e ɛ invv æ/ when F1 or F2 varied in frequency. Comparison of YNH with YHI results failed to reveal significant differences between groups in terms of performance on vowel discrimination, in conditions of similar audibility by using both noise masking to elevate the hearing thresholds of the YNH and applying frequency-specific gain to the YHI listeners. Further, analysis of learning curves suggests that while the YHI listeners completed an average of 46% more test blocks than YNH listeners, the YHI achieved a level of discrimination similar to that of the YNH within the same number of blocks. Apparently, when age and gender are closely matched between young hearing-impaired and normal-hearing adults, performance on vowel tasks may be explained by audibility alone.

  13. Improved achromatization of phase mask coronagraphs using colored apodization

    CERN Document Server

    N'Diaye, M; Cuevas, S; Soummer, R; Sánchez-Pérez, C; Zamkotsian, F

    2011-01-01

    For direct imaging of exoplanets, a stellar coronagraph helps to remove the image of an observed bright star by attenuating the diffraction effects caused by the telescope aperture of diameter D. The Dual Zone Phase Mask (DZPM) coronagraph constitutes a promising concept since it theoretically offers a small inner working angle (IWA \\sim \\lambda_0/D), good achromaticity and high starlight rejection, typically reaching a 1e6 contrast at 5 \\lambda_0/D from the star over a spectral bandwidth \\Delta\\lambda/\\lambda_0 of 25% (similar to H-band). This last value proves to be encouraging for broadband imaging of young and warm Jupiter-like planets. Contrast levels higher than 1e6 are however required for the observation of older and/or less massive companions over a finite spectral bandwidth. An achromatization improvement of the DZPM coronagraph is therefore mandatory to reach such performance. In its design, the DZPM coronagraph uses a grey (or achromatic) apodization. We propose to replace it by a colored apodizat...

  14. Adaptive multiwavelet-based watermarking through JPW masking.

    Science.gov (United States)

    Cui, Lihong; Li, Wenguo

    2011-04-01

    In this paper, a multibit, multiplicative, spread spectrum watermarking using the discrete multiwavelet (including unbalanced and balanced multiwavelet) transform is presented. Performance improvement with respect to existing algorithm is obtained by means of a new just perceptual weighting (JPW) model. The new model incorporates various masking effects of human visual perception by taking into account the eye's sensitivity to noise changes depending on spatial frequency, luminance and texture of all the image subbands. In contrast to conventional JND threshold model, JPW describing minimum perceptual sensitivity weighting to noise changes, is fitter for nonadditive watermarking. Specifically, watermarking strength is adaptively adjusted to obtain minimum perceptual distortion by employing the JPW model. Correspondingly, an adaptive optimum decoding is derived using a statistic model based on generalized-Gaussian distribution (GGD) for multiwavelet coefficients of the cover-image. Furthermore, the impact of multiwavelet characteristics on proposed watermarking scheme is also analyzed. Finally, the experimental results show that proposed JPW model can improve the quality of the watermarked image and give more robustness of the watermark as compared with a variety of state-of-the-art algorithms.

  15. Trait dominance promotes reflexive staring at masked angry body postures.

    Directory of Open Access Journals (Sweden)

    Ruud Hortensius

    Full Text Available It has been shown that dominant individuals sustain eye-contact when non-consciously confronted with angry faces, suggesting reflexive mechanisms underlying dominance behaviors. However, dominance and submission can be conveyed and provoked by means of not only facial but also bodily features. So far few studies have investigated the interplay of body postures with personality traits and behavior, despite the biological relevance and ecological validity of these postures. Here we investigate whether non-conscious exposure to bodily expressions of anger evokes reflex-like dominance behavior. In an interactive eye-tracking experiment thirty-two participants completed three social dominance tasks with angry, happy and neutral facial, bodily and face and body compound expressions that were masked from consciousness. We confirmed our predictions of slower gaze-aversion from both non-conscious bodily and compound expressions of anger compared to happiness in high dominant individuals. Results from a follow-up experiment suggest that the dominance behavior triggered by exposure to bodily anger occurs with basic detection of the category, but not recognition of the emotional content. Together these results suggest that dominant staring behavior is reflexively driven by non-conscious perception of the emotional content and triggered by not only facial but also bodily expression of anger.

  16. Differential effectiveness of cues in informational masking studies

    Science.gov (United States)

    Richards, Virginia M.; Huang, Rong; Kidd, Gerald

    2001-05-01

    For the detection of a tone added to random multitone maskers, playing a preview of the masker before detection trials can reduce thresholds compared to when there is no preview. In contrast, playing a preview of the signal-plus-masker does not provide a release from masking. This differential effectiveness of cues was examined in several conditions. Using the method of constant stimuli and a yes/no task, observers detected a 1000-Hz tone added to six-tone maskers. Prior to each trial, the frequencies of the masker components were randomly drawn. Two types of cues were tested, either a copy of the masker or a copy of the signal-plus-masker. The cues were presented either before or after the yes/no presentation interval. Finally, data were collected either blocked for each condition or the trials from the four conditions were interleaved. D-prime values were higher when the conditions were blocked than when they were interleaved. The pattern of results was the same in both situations; d was highest for pretrial masker cues, lowest for pretrial signal-plus-masker cues, and intermediate when either cue followed the trial interval. [Work supported by NIH/NIDCD.

  17. Minienvironment solutions: special concepts for mask-systems

    Science.gov (United States)

    Dobler, M.; Rüb, M.; Billen, T.

    2011-03-01

    Cleanroom technology is a principle pre-condition and the enabling technology for contamination free manufacturing. With the transition from large cleanroom facilities for semiconductor manufacturing to localized encapsulated cleanroom solutions which are called minienvironments the traditional cleanroom technology is extended into a new field of applications. With view to the highest requirements in semiconductor industries and especially in the mask area, extraordinary concepts and solutions has to be developed and applied. In this contribution the fundamental considerations about the different concepts for minienvironments are outlined and reviewed. A set of various parameters involved in a design process for a state of the art minienvironment are given and discussed in detail. The resulting different concepts are presented and the strength of each concept is discussed. The resulting minienvironment solutions are demonstrated on three characteristic examples and options, alternatives and the advantages of the individual concepts are mentioned. Based on the current status of minienvironment technology an out-look is given about future challenges and open questions to be solved.

  18. Binaural cues provide for a release from informational masking.

    Science.gov (United States)

    Tolnai, Sandra; Dolležal, Lena-Vanessa; Klump, Georg M

    2015-10-01

    Informational masking (IM) describes the insensitivity of detecting a change in sound features in a complex acoustical environment when such a change could easily be detected in the absence of distracting sounds. IM occurs because of the similarity between deviant sound and distracting sounds (so-called similarity-based IM) and/or stimulus uncertainty stemming from trial-to-trial variability (so-called uncertainty-based IM). IM can be abolished if similarity-based or uncertainty-based IM are minimized. Here, we modulated similarity-based IM using binaural cues. Standard/deviant tones and distracting tones were presented sequentially, and level-increment thresholds were measured. Deviant tones differed from standard tones by a higher sound level. Distracting tones covered a wide range of levels. Standard/deviant tones and distracting tones were characterized by their interaural time difference (ITD), interaural level difference (ILD), or both ITD and ILD. The larger the ITD or ILD was, the better similarity-based IM was overcome. If both interaural differences were applied to standard/deviant tones, the release from IM was larger than when either interaural difference was used. The results show that binaural cues are potent cues to abolish similarity-based IM and that the auditory system makes use of multiple available cues. PMID:26413722

  19. Fixed mask assembly research for APS insertion devices

    International Nuclear Information System (INIS)

    The Fixed Mask Assembly (FMA) is the first component to interact with the photon beam. Two sets of a pair of FMA channels, vertically and horizontally disposed, contain the beam rather than define it. They are subject to very large heat fluxes during containment. In current practice, the FMA channels are made of heavy, seamless copper, have rectangular cross-sections, and are cooled internally with water. Channels are set at grazing angles ranging from I to 6 degrees with respect to the beam, depending on the type of insertion device. APS insertion devices will impose higher heat fluxes on FMAS. Therefore, a need exists to improve the FMA engineering, keeping in mind the current design criteria and philosophy of FMAS. Preliminary analysis of current heat transfer practice indicates that the major resistance to heat transfer is on the coolant side. Therefore, FMA cooling would benefit from enhanced heat transfer on the coolant side. With this principle in mind, an experimental program has been undertaken to explore the feasibility of using high-performance copper tube configurations which are expected to yield heat transfer coefficients, open-quotes hclose quotes, in single phase flow systems 2 to 5(?) times higher than equivalent plain tubes. In this report, the experimental scope and a preliminary analysis of high-performance copper tube configurations are described

  20. Affective Networks

    Directory of Open Access Journals (Sweden)

    Jodi Dean

    2010-02-01

    Full Text Available This article sets out the idea of affective networks as a constitutive feature of communicative capitalism. It explores the circulation of intensities in contemporary information and communication networks, arguing that this circulation should be theorized in terms of the psychoanalytic notion of the drive. The article includes critical engagements with theorists such as Guy Debord, Jacques Lacan, Tiziana Terranova, and Slavoj Zizek.

  1. Safety And Efficacy Of Proseal Laryngeal Mask Airway Versus Classic Laryngeal Mask Airway And Endo Tracheal Tube During Elective surgery

    Directory of Open Access Journals (Sweden)

    Soad A. Mansour , Wafaa G.Ahmed , Kawthar A. Azzam ,Tarek M. EL said

    2005-12-01

    Full Text Available The present study was performed to compare safety , efficacy of Proseal Laryngeal Mask Airway (PLMA, classic Laryngeal mask airway (LMA and cuffed Endo Tracheal Tube (ETT as a ventilatory device during controlled positive pressure ventilation and airway management , Haemodynamic response to insertion and removal, gastric tube insertion through either device, air leak detection and assessment of position by fiberoptic bronchoscope . Forty five ASA I or II patients aged between 18-55 years old , were divided equally into three groups of fifteen patients each , and airway management either through PLMA(groupI,classic LMA (groupIIand ETT (group III . All patients were premedicated by zantac hydrochloride 150 mg orally at mid night and two hours before the operation ­ Anaesthesia was induced with fentanyl 2 ug/kg and propofol 2.5 mg /kg and maintenance was with a mixture of 50% N2O , 50% O2 and isoflurane 1 - 1.5 % and rocuronium 0.5 mg /kg followed by continous infusion of rocuronium 0.3-0.6 mg/kg/hr A proper size PLMA , classic LMA or ETT was selected oxygenation and ventilation were optimal in 100% in group I and III while in group II 80% optimal and suboptimal in 13.3% and failed in 6.7 % . Haemodynamic parameters showed that significantly increase in HR and MAP in the three studied groups especially at insertion and removal of the airway device with statisticaly significant difference between group I,II in comparison to group III, comparison of gastric tube insertion showed that positive insertion was 86.7% in group I and in 46.7% in group II, while in group III positive insertion was 100% air leak was detected by epigastric auscultation which signified lower leakage in PLMA group than LMA group . Position assessment by fiberoptic bronchoscope in PLMA group was grade 4 in 5 patients , grade 3 in 5 patients , grade2 in 4 patients and grade 1 in 1 patient while in LMA group it was grade 4 in 7 patients , grade 3 in 6 patients , grade 2 in 2

  2. Design of Polymeric Nanofiber Gauze Mask to Prevent Inhaling PM2.5 Particles from Haze Pollution

    OpenAIRE

    Xingzhou Li; Yan Gong

    2015-01-01

    Recently, PM2.5 (particulate matter with diameter of 2.5 micron or less) has become a major health hazard from the polluted air in many cities in China. The regular gauze masks are used to prevent inhaling the PM2.5 fine particles; however, those masks are not able to filter out the PM2.5 because of the large porosity of the mask materials. Some well-prevented masks usually have poor breathability, which increases other health risks. In this study, a polysulfone based nanofiber for mask filtr...

  3. Performance of an N95 filtering facepiece particulate respirator and a surgical mask during human breathing: two pathways for particle penetration.

    Science.gov (United States)

    Grinshpun, Sergey A; Haruta, Hiroki; Eninger, Robert M; Reponen, Tiina; McKay, Roy T; Lee, Shu-An

    2009-10-01

    The protection level offered by filtering facepiece particulate respirators and face masks is defined by the percentage of ambient particles penetrating inside the protection device. There are two penetration pathways: (1) through the faceseal leakage, and the (2) filter medium. This study aimed at differentiating the contributions of these two pathways for particles in the size range of 0.03-1 microm under actual breathing conditions. One N95 filtering facepiece respirator and one surgical mask commonly used in health care environments were tested on 25 subjects (matching the latest National Institute for Occupational Safety and Health fit testing panel) as the subjects performed conventional fit test exercises. The respirator and the mask were also tested with breathing manikins that precisely mimicked the prerecorded breathing patterns of the tested subjects. The penetration data obtained in the human subject- and manikin-based tests were compared for different particle sizes and breathing patterns. Overall, 5250 particle size- and exercise-specific penetration values were determined. For each value, the faceseal leakage-to-filter ratio was calculated to quantify the relative contributions of the two penetration pathways. The number of particles penetrating through the faceseal leakage of the tested respirator/mask far exceeded the number of those penetrating through the filter medium. For the N95 respirator, the excess was (on average) by an order of magnitude and significantly increased with an increase in particle size (p < 0.001): approximately 7-fold greater for 0.04 microm, approximately 10-fold for 0.1 microm, and approximately 20-fold for 1 microm. For the surgical mask, the faceseal leakage-to-filter ratio ranged from 4.8 to 5.8 and was not significantly affected by the particle size for the tested submicrometer fraction. Facial/body movement had a pronounced effect on the relative contribution of the two penetration pathways. Breathing intensity and

  4. Performance of an N95 filtering facepiece particulate respirator and a surgical mask during human breathing: two pathways for particle penetration.

    Science.gov (United States)

    Grinshpun, Sergey A; Haruta, Hiroki; Eninger, Robert M; Reponen, Tiina; McKay, Roy T; Lee, Shu-An

    2009-10-01

    The protection level offered by filtering facepiece particulate respirators and face masks is defined by the percentage of ambient particles penetrating inside the protection device. There are two penetration pathways: (1) through the faceseal leakage, and the (2) filter medium. This study aimed at differentiating the contributions of these two pathways for particles in the size range of 0.03-1 microm under actual breathing conditions. One N95 filtering facepiece respirator and one surgical mask commonly used in health care environments were tested on 25 subjects (matching the latest National Institute for Occupational Safety and Health fit testing panel) as the subjects performed conventional fit test exercises. The respirator and the mask were also tested with breathing manikins that precisely mimicked the prerecorded breathing patterns of the tested subjects. The penetration data obtained in the human subject- and manikin-based tests were compared for different particle sizes and breathing patterns. Overall, 5250 particle size- and exercise-specific penetration values were determined. For each value, the faceseal leakage-to-filter ratio was calculated to quantify the relative contributions of the two penetration pathways. The number of particles penetrating through the faceseal leakage of the tested respirator/mask far exceeded the number of those penetrating through the filter medium. For the N95 respirator, the excess was (on average) by an order of magnitude and significantly increased with an increase in particle size (p < 0.001): approximately 7-fold greater for 0.04 microm, approximately 10-fold for 0.1 microm, and approximately 20-fold for 1 microm. For the surgical mask, the faceseal leakage-to-filter ratio ranged from 4.8 to 5.8 and was not significantly affected by the particle size for the tested submicrometer fraction. Facial/body movement had a pronounced effect on the relative contribution of the two penetration pathways. Breathing intensity and

  5. Temporal phase mask encrypted optical steganography carried by amplified spontaneous emission noise.

    Science.gov (United States)

    Wu, Ben; Wang, Zhenxing; Shastri, Bhavin J; Chang, Matthew P; Frost, Nicholas A; Prucnal, Paul R

    2014-01-13

    A temporal phase mask encryption method is proposed and experimentally demonstrated to improve the security of the stealth channel in an optical steganography system. The stealth channel is protected in two levels. In the first level, the data is carried by amplified spontaneous emission (ASE) noise, which cannot be detected in either the time domain or spectral domain. In the second level, even if the eavesdropper suspects the existence of the stealth channel, each data bit is covered by a fast changing phase mask. The phase mask code is always combined with the wide band noise from ASE. Without knowing the right phase mask code to recover the stealth data, the eavesdropper can only receive the noise like signal with randomized phase.

  6. 100-Meter Resolution Land/Water Mask of the Conterminous United States - Direct Download

    Data.gov (United States)

    U.S. Geological Survey, Department of the Interior — This Land/Water Mask is a 100-meter resolution image of the conterminous United States, with separate values for oceans and for land areas of the United States,...

  7. 100-Meter Resolution Land/Water Mask of Alaska - Direct Download

    Data.gov (United States)

    U.S. Geological Survey, Department of the Interior — This Land/Water Mask is a 100-meter resolution image of Alaska, with separate values for oceans and for land areas of the United States, Canada, and Russia.

  8. A soft photo-mask with embedded carbon black and its application in contact photolithography

    International Nuclear Information System (INIS)

    This paper presents a new type of soft photo-mask which can be used in contact photolithography for achieving small line-width, large area, and high throughput ultraviolet (UV) patterning. It starts from a polydimethylsiloxane (PDMS) mold replicated from a silicon master mold. A carbon black photo-resist (PR) is spin-coated on top of the PDMS mold and then thermally cured. After a contact transfer process, the solidified carbon black PR exists only in the concave region of the PDMS mold, which converts the PDMS mold into a carbon-black/PDMS soft photo-mask. Due to its flexibility, this soft photo-mask can be used in contact photolithography on a slightly curved substrate. Experiments on preparing this new soft photo-mask and its application for fabricating patterned sapphire substrates (PSSs) used in the light-emitting-diode (LED) industry are carried out. Successful results are observed. (paper)

  9. Simple Strehl ratio based method for pupil phase mask's optimization in wavefront coding system

    Institute of Scientific and Technical Information of China (English)

    Wenzi Zhang; Yanping Chen; Tingyu Zhao; Zi Ye; Feihong Yu

    2006-01-01

    @@ By applying the wavefront coding technique to an optical system,the depth of focus can be greatly increased.Several complicated methods have already been taken to optimize for the best pupil phase mask in ideal condition.Here a simple Strehl ratio based method with only the standard deviation method used to evaluate the Strehl ratio stability over the depth of focus is applied to optimize for the best coefficients of pupil phase mask in practical optical systems.Results of imaging simulations for optical systems with and without pupil phase mask are presented,and the sharpness of image is calculated for comparison.The optimized pupil phase mask shows good results in extending the depth of focus.

  10. Stimulus detection after interruption of the feedforward response in a backward masking paradigm.

    Science.gov (United States)

    Romeo, August; Puig, Maria Sole; Zapata, Laura Pérez; Lopez-Moliner, Joan; Supèr, Hans

    2012-10-01

    In backward masking, a target stimulus is rendered invisible by the presentation of a second stimulus, the mask. When the mask is effective, neural responses to the target are suppressed. Nevertheless, weak target responses sometimes may produce a behavioural response. It remains unclear whether the reduced target response is a purely feedforward response or that it includes recurrent activity. Using a feedforward neural network of biological plausible spiking neurons, we tested whether a transient spike burst is sufficient for face categorization. After training the network, the system achieved face/non-face categorization for sets of grayscale images. In a backward masking paradigm, the transient burst response was cut off thereby reducing the feedforward target response. Despite the suppressed feedforward responses stimulus classification remained robust. Thus according to our model data stimulus detection is possible with purely, suppressed feedforward responses.

  11. Bio-mimic design of PM2.5 anti-smog masks

    Directory of Open Access Journals (Sweden)

    Shen Jing

    2014-01-01

    Full Text Available The basic property of anti-smog masks is to block PM2.5 with excellent air permeability. A multi-layer nanofiber woven fabric with hierarchical structure is the best candidate for this purpose.

  12. High-emulation mask recognition with high-resolution hyperspectral video capture system

    Science.gov (United States)

    Feng, Jiao; Fang, Xiaojing; Li, Shoufeng; Wang, Yongjin

    2014-11-01

    We present a method for distinguishing human face from high-emulation mask, which is increasingly used by criminals for activities such as stealing card numbers and passwords on ATM. Traditional facial recognition technique is difficult to detect such camouflaged criminals. In this paper, we use the high-resolution hyperspectral video capture system to detect high-emulation mask. A RGB camera is used for traditional facial recognition. A prism and a gray scale camera are used to capture spectral information of the observed face. Experiments show that mask made of silica gel has different spectral reflectance compared with the human skin. As multispectral image offers additional spectral information about physical characteristics, high-emulation mask can be easily recognized.

  13. Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Our main objective in this study is to design, fabricate, and analyze the partially transparent petaled (PTP) masks using gray scale lithography to suppress the...

  14. Randomized trial of prongs or mask for nasal continuous positive airway pressure in preterm infants.

    LENUS (Irish Health Repository)

    Kieran, Emily A

    2012-11-01

    To determine whether nasal continuous positive airway pressure (NCPAP) given with nasal prongs compared with nasal mask reduces the rate of intubation and mechanical ventilation in preterm infants within 72 hours of starting therapy.

  15. Accurate characterization of mask defects by combination of phase retrieval and deterministic approach

    Science.gov (United States)

    Park, Min-Chul; Leportier, Thibault; Kim, Wooshik; Song, Jindong

    2016-06-01

    In this paper, we present a method to characterize not only shape but also depth of defects in line and space mask patterns. Features in a mask are too fine for conventional imaging system to resolve them and coherent imaging system providing only the pattern diffracted by the mask are used. Then, phase retrieval methods may be applied, but the accuracy it too low to determine the exact shape of the defect. Deterministic methods have been proposed to characterize accurately the defect, but it requires a reference pattern. We propose to use successively phase retrieval algorithm to retrieve the general shape of the mask and then deterministic approach to characterize precisely the defects detected.

  16. MISR FIRSTLOOK radiometric camera-by-camera Cloud Mask V001

    Data.gov (United States)

    National Aeronautics and Space Administration — This file contains the FIRSTLOOK Radiometric camera-by-camera Cloud Mask (RCCM) dataset produced using ancillary inputs (RCCT) from the previous time period. It is...

  17. Fabrication of Partially Transparent Petaled Masks Using Gray Scale Lithography Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Our main objective in this study is to design, fabricate, and analyze the partially transparent petaled(PTP) masks using gray scale lithography to suppress the...

  18. Visual masking with frontally applied pre-stimulus TMS and its subject-specific neural correlates.

    Science.gov (United States)

    Rutiku, Renate; Tulver, Kadi; Aru, Jaan; Bachmann, Talis

    2016-07-01

    The visibility of a visual target stimulus depends on the local state of the early visual cortex shortly before the stimulus itself is presented. This view is supported by the observation that occipitally applied pre-stimulus TMS can disrupt subsequent information processing leading to visual masking effects. According to another line of accumulating evidence, however, global pre-stimulus connectivity patterns could be as crucial as local cortical states. In line with the latter view we show that pre-stimulus masking occurs even if TMS is directed to the frontal cortex. Importantly, the individual extent of this effect is strongly correlated with the subject-specific peak latency of a late positive TMS-evoked potential. Our results thus suggest a third type of masking occurring neither through direct interaction with visual areas nor by a modal visual masking input. Our results also shed light on the inter-individual differences in TMS research in general.

  19. Tunable wavefront coded imaging system based on detachable phase mask: Mathematical analysis, optimization and underlying applications

    Science.gov (United States)

    Zhao, Hui; Wei, Jingxuan

    2014-09-01

    The key to the concept of tunable wavefront coding lies in detachable phase masks. Ojeda-Castaneda et al. (Progress in Electronics Research Symposium Proceedings, Cambridge, USA, July 5-8, 2010) described a typical design in which two components with cosinusoidal phase variation operate together to make defocus sensitivity tunable. The present study proposes an improved design and makes three contributions: (1) A mathematical derivation based on the stationary phase method explains why the detachable phase mask of Ojeda-Castaneda et al. tunes the defocus sensitivity. (2) The mathematical derivations show that the effective bandwidth wavefront coded imaging system is also tunable by making each component of the detachable phase mask move asymmetrically. An improved Fisher information-based optimization procedure was also designed to ascertain the optimal mask parameters corresponding to specific bandwidth. (3) Possible applications of the tunable bandwidth are demonstrated by simulated imaging.

  20. The Effect of a Diving Mask on Intraocular Pressure in a Healthy Population

    Science.gov (United States)

    Goenadi, Catherina Josephine; Law, David Zhiwei; Lee, Jia Wen; Ong, Ee Lin; Chee, Wai Kitt; Cheng, Jason

    2016-01-01

    Purpose Swimming goggles increase the intraocular pressure (IOP) via the periorbital frame pressure and suction effect. In comparison, diving masks have a larger frame rim and incorporate the nose. The exact effect(s) of diving masks on IOP is unknown. This study evaluates the influence of diving masks on IOP in normal, healthy subjects. Methods Tonometry was performed in both eyes of all subjects with an AVIA®Tono-Pen by a single investigator. Measurements were taken at baseline without the diving mask and with the subjects wearing a small-volume, double-window diving mask, but with the mask lenses removed. Two IOP readings in each eye were measured, and an additional reading was measured if the difference between the initial 2 was ≥2 mm Hg. Central corneal thickness (CCT) was also measured in each eye, using a contact pachymeter (OcuScan®Alcon). Results Forty eyes of 20 healthy volunteers (age 29.7 ± 9.3 years; range 21–52) were included. The mean CCT was 544.4 ± 43.5 µm. The mean IOP before the diving mask was worn had been 17.23 ± 2.18 mm Hg (n = 40). The IOP decreased by 0.43 mm Hg (p $1003c; 0.05) to 16.80 ± 2.57 mm Hg after the diving mask had been put on. There was no correlation between IOP change and age (r = 0.143, p = 0.337), gender (r = −0.174, p = 0.283) or CCT (r = −0.123, p = 0.445). Conclusion There was no increase in IOP after the diving mask had been worn. A small but statistically significant decrease in IOP was observed. This study demonstrates that unlike swimming goggles, the strap tension and frame pressure on the periorbital tissue from a diving mask does not increase IOP. Diving masks may be a suitable alternative to swimming goggles for patients with advanced glaucoma or glaucoma filtration surgery. PMID:27462262

  1. The Effect of a Diving Mask on Intraocular Pressure in a Healthy Population

    Directory of Open Access Journals (Sweden)

    Catherina Josephine Goenadi

    2016-06-01

    Full Text Available Purpose: Swimming goggles increase the intraocular pressure (IOP via the periorbital frame pressure and suction effect. In comparison, diving masks have a larger frame rim and incorporate the nose. The exact effect(s of diving masks on IOP is unknown. This study evaluates the influence of diving masks on IOP in normal, healthy subjects. Methods: Tonometry was performed in both eyes of all subjects with an AVIA®Tono-Pen by a single investigator. Measurements were taken at baseline without the diving mask and with the subjects wearing a small-volume, double-window diving mask, but with the mask lenses removed. Two IOP readings in each eye were measured, and an additional reading was measured if the difference between the initial 2 was ≥2 mm Hg. Central corneal thickness (CCT was also measured in each eye, using a contact pachymeter (OcuScan®Alcon. Results: Forty eyes of 20 healthy volunteers (age 29.7 ± 9.3 years; range 21–52 were included. The mean CCT was 544.4 ± 43.5 µm. The mean IOP before the diving mask was worn had been 17.23 ± 2.18 mm Hg (n = 40. The IOP decreased by 0.43 mm Hg (p < 0.05 to 16.80 ± 2.57 mm Hg after the diving mask had been put on. There was no correlation between IOP change and age (r = 0.143, p = 0.337, gender (r = –0.174, p = 0.283 or CCT (r = –0.123, p = 0.445. Conclusion: There was no increase in IOP after the diving mask had been worn. A small but statistically significant decrease in IOP was observed. This study demonstrates that unlike swimming goggles, the strap tension and frame pressure on the periorbital tissue from a diving mask does not increase IOP. Diving masks may be a suitable alternative to swimming goggles for patients with advanced glaucoma or glaucoma filtration surgery.

  2. Analytical and experimental demonstration of depth of field extension for incoherent imaging system with a standard sinusoidal phase mask

    Institute of Scientific and Technical Information of China (English)

    Hui Zhao; Yingcai Li

    2012-01-01

    The wavefront coding technique is used to enlarge the depth of field (DOF) of incoherent imaging systems.The key to wavefront coding lies in the design of suitable phase masks. To date,numerous kinds of phase masks are proposed.However,further understanding is needed regarding phase mask with its phase function being in a standard sinusoidal form.Therefore,the characteristics of such a phase mask are studied in this letter.Deriving the defocused optical transfer function (OTF) analytically proves that the standard sinusoidal phase mask is effective in extending the DOF,and actual experiments confirm the numerical results.At the same time,with the Fisher information as a criterion,the standard sinusoidal phase mask shows a higher tolerance to focus errors (especially severe focus errors) than the classical cubic phase mask.%The wavefront coding technique is used to enlarge the depth of field (DOF) of incoherent imaging systems. The key to wavefront coding lies in the design of suitable phase masks. To date, numerous kinds of phase masks are proposed. However, further understanding is needed regarding phase mask with its phase function being in a standard sinusoidal form. Therefore, the characteristics of such a phase mask are studied in this letter. Deriving the defocused optical transfer function (OTF) analytically proves that the standard sinusoidal phase mask is effective in extending the DOF, and actual experiments confirm the numerical results. At the same time, with the Fisher information as a criterion, the standard sinusoidal phase mask shows a higher tolerance to focus errors (especially severe focus errors) than the classical cubic phase mask.

  3. A high efficiency industrial polysilicon solar cell with a honeycomb-like surface fabricated by wet etching using a photoresist mask

    Science.gov (United States)

    Zhang, Hong; Ding, Bin; Chen, Tianhang

    2016-11-01

    In this paper, an effective and low cost method of texturization was introduced into the fabrication process for industrial multicrystalline silicon solar cell production. The purpose of the method was to reduce reflectance by creating a honeycomb-like textured surface using a masked wet etching process. A negative photoresist film was selected as an etching mask. Although large surface roughness of wafer was considered to affect the adhesion and acid resistance of etching mask, a honeycomb-like textured surface with a pitch of 18 μm was fabricated successfully. The etched pits had a nearly smooth spherical segment surface, an average aperture of 15.1 μm, and a depth of 6.5 μm. This regular textured surface had a low light reflectivity of approximately 20.5% and greatly increased the carrier lifetime. Compared with multicrystalline silicon solar cells textured by conventional acid etching, the average short circuit current increased by 2.2% and the average efficiency increased from 17.41% to 17.75%, a net gain of 0.34%. And a high throughput above 2400 pieces per hour was obtained. This texturing technique is expected to promote the application of diamond-wire cut multicrystalline silicon wafers with the low saw-damage in the future.

  4. EUV mask cleans comparison of frontside and dual-sided concurrent cleaning

    Science.gov (United States)

    Cheong, Lin Lee; Kindt, Louis; Turley, Christina; Leonhard, Dusty; Boyle, John; Robinson, Chris; Rankin, Jed; Corliss, Daniel

    2015-03-01

    The cleaning requirements for EUV masks are more complex than optical masks due to the absence of available EUVcompatible pellicles. EUV masks must therefore be capable of undergoing more than 100 cleaning cycles with minimum impact to lithographic performance. EUV masks are created on substrates with 40 multilayers of silicon and molybdenum to form a Bragg reflector, capped with a 2.5nm-thick ruthenium layer and a tantalum-based absorber; during usage, both ruthenium and absorber are exposed to the cleaning process. The CrN layer on the backside is used to enable electrostatic clamping. This clamp side must also be free of particles that could impact printing and overlay, and particles could also potentially migrate to the frontside and create defects. Thus, the cleaning process must provide decent particle removal efficiencies on both front- and backside while maintaining reflectivity with minimal surface roughness change. In this paper, we report progress developing a concurrent patterned-side and clamped-side cleaning process that achieves minimal reflectivity change over 120 cleaning cycles, with XPS and EDS indicating the presence of ruthenium after 125 cleaning cycles. The change in surface roughness over 100 cleaning cycles is within the noise (0.0086nm) on a mask blank, and SEM inspection of 100nm and 200nm features on patterned masks after undergoing 100 cleaning cycles show no indications of ruthenium pitting or significant surface damage. This process was used on test masks to remove particles from both sides that would otherwise inhibit these masks from being used in the scanner.

  5. Face mask sampling for the detection of Mycobacterium tuberculosis in expelled aerosols.

    Directory of Open Access Journals (Sweden)

    Caroline M L Williams

    Full Text Available Although tuberculosis is transmitted by the airborne route, direct information on the natural output of bacilli into air by source cases is very limited. We sought to address this through sampling of expelled aerosols in face masks that were subsequently analyzed for mycobacterial contamination.In series 1, 17 smear microscopy positive patients wore standard surgical face masks once or twice for periods between 10 minutes and 5 hours; mycobacterial contamination was detected using a bacteriophage assay. In series 2, 19 patients with suspected tuberculosis were studied in Leicester UK and 10 patients with at least one positive smear were studied in The Gambia. These subjects wore one FFP30 mask modified to contain a gelatin filter for one hour; this was subsequently analyzed by the Xpert MTB/RIF system.In series 1, the bacteriophage assay detected live mycobacteria in 11/17 patients with wearing times between 10 and 120 minutes. Variation was seen in mask positivity and the level of contamination detected in multiple samples from the same patient. Two patients had non-tuberculous mycobacterial infections. In series 2, 13/20 patients with pulmonary tuberculosis produced positive masks and 0/9 patients with extrapulmonary or non-tuberculous diagnoses were mask positive. Overall, 65% of patients with confirmed pulmonary mycobacterial infection gave positive masks and this included 3/6 patients who received diagnostic bronchoalveolar lavages.Mask sampling provides a simple means of assessing mycobacterial output in non-sputum expectorant. The approach shows potential for application to the study of airborne transmission and to diagnosis.

  6. Inter-observer variation in masked and unmasked images for quality evaluation of clinical radiographs

    International Nuclear Information System (INIS)

    Purpose: To investigate the influence of masking on the inter-observer variation in image quality evaluation of clinical radiographs of chest and lumbar spine. Background: Inter-observer variation is a big problem in image quality evaluation since this variation is often much bigger than the variation in image quality between, for example, two radiographic systems. In this study, we have evaluated the effect of masking on the inter-observer variation. The idea of the masking was to force every observer to view exactly the same part of the image and to avoid the effect of the overall 'first impression' of the image. A discussion with a group of European expert radiologists before the study indicated that masking might be a good way to reduce the inter-observer variation. Methods: Five chest and five lumbar spine radiographs were collected together with detailed information regarding exposure conditions. The radiographs were digitised with a high-performance scanner and five different manipulations were performed, simulating five different exposure conditions. The contrast, noise and spatial resolution were manipulated by this method. The images were printed onto the film and the individual masks were produced for each film, showing only the parts of the images that were necessary for the image quality evaluation. The quality of the images was evaluated on ordinary viewing boxes by a large group of experienced radiologists. The images were examined with and without the masks with a set of image criteria (if fulfilled, 1 point; and not fulfilled, 0 point), and the mean score was calculated for each simulated exposure condition. Results: The results of this study indicate that - contrary to what was supposed - the inter-observer variation increased when the images were masked. In some cases, especially for chest, this increase was statistically significant. Conclusions: Based on the results of this study, image masking in studies of fulfilment of image criteria cannot

  7. Super-resolution with complex masks using a phase-only LCD.

    Science.gov (United States)

    Alcalá Ochoa, Noé; Pérez-Santos, Carlos

    2013-12-15

    Two methods to achieve super-resolution with complex masks displayed in one-phase-only liquid crystal display (LCD) are described. The first method decomposes the complex mask into two phase-only elements with a posterior recombination using an interferometer, and the second method simultaneously encodes the amplitude and the phase by modulating the amplitude of the carrier phase. Experimental results are presented using a liquid crystal on silicon spatial light modulator under reflection.

  8. Effects of a cellulose mask synthesized by a bacterium on facial skin characteristics and user satisfaction

    Directory of Open Access Journals (Sweden)

    Amnuaikit T

    2011-06-01

    Full Text Available Thanaporn Amnuaikit, Toon Chusuit, Panithi Raknam, Prapaporn BoonmeDepartment of Pharmaceutical Technology, Faculty of Pharmaceutical Sciences, Prince of Songkla University, Songkhla, ThailandBackground: Cellulose masks obtained from natural sources such as bacteria are of interest as cosmetic devices for the treatment of dry skin because they not only improve hydration of the skin, but have low toxicity and are biodegradable. The aims of this study were to determine the in vivo effects of a cellulose mask obtained from Acetobacter xylinum on skin characteristics and to evaluate user satisfaction with the product.Methods: Thirty healthy Thai volunteers aged 21–40 years participated in the study. The volunteers were randomly separated into a control group and an experimental group. For the control group, volunteers were assigned to apply moist towels to the face for 25 minutes. For the experimental group, the volunteers were assigned to apply the masks, ie, translucent patches which could be fitted onto the face for the same period. The following week, the groups were changed over to the alternative treatment. Skin moisture, sebum, elasticity, texture, dullness, and desquamation levels were assessed using a system used for routine skin counseling before applying the trial product and five minutes after its removal. Degree of satisfaction with use of the cellulose mask was investigated using a five-point rating scale.Results: The cellulose mask increased moisture levels in the skin significantly more than moist towels (P < 0.05 after a single application. No obvious effects on other skin characteristics were found. The cellulose mask product rated around 4/5 on the satisfaction rating scale.Conclusions: A single application of the trial cellulose mask enhanced moisture uptake by facial skin. Users also reported being satisfied with the trial product.Keywords: bacterial cellulose, facial mask, skin characteristics, skin hydration, user

  9. Reduced mortality among young endangered masked bobwhite quail fed oxytetracycline-supplemented diets

    Science.gov (United States)

    Serafin, J.A.

    1982-01-01

    Two experiments were conducted to examine the effect of oxytetracycline-supplemented diets on mortality of young endangered masked bobwhite quail (Colinus virginianus ridgwayi). Inclusion of oxytetracycline at 200 g per ton in the feed for 6 weeks resulted in a marked, significant reduction in mortality of young masked bobwhite quail raised in captivity. Including the antibiotic in feed during the first week of life reduced mortality as effectively as feeding it for a longer period.

  10. Diagnosis of Fault Modes Masked by Control Loops with an Application to Autonomous Hovercraft Systems

    OpenAIRE

    Ioannis A. Raptis; Rodney Martin; Robert Mah; Nikunj Oza; Dimitri Mavris; Sehwan Oh; Kilsoo Kim; Young-Ki Lee; Christopher Sconyers; George J. Vachtsevanos

    2013-01-01

    This paper introduces a methodology for the design, testing and assessment of incipient failure detection techniques for failing components/systems of an autonomous vehicle masked or hidden by feedback control loops. It is recognized that the optimum operation of critical assets (aircraft, autonomous systems, etc.) may be compromised by feedback control loops by masking severe fault modes while compensating for typical disturbances. Detrimental consequences of such occurrences include the ina...

  11. The effectiveness of surgical face masks in the operating room : a systematic review / Nontsokolo Sylvia Makeleni.

    OpenAIRE

    Makeleni, Nontsokolo Sylvia

    2012-01-01

    Surgical face masks have been designed to protect health care professionals from the splashes of the patients’ blood or body fluids and also to minimise the transmission of oro- and nasopharyngeal bacteria from the surgical team to the patient’s wounds, thereby decreasing the likelihood of postoperative surgical site infections during a surgical procedure. However, there are several ways in which surgical face masks could potentially contribute to contamination of the wound during a surgical ...

  12. The extended functional neuroanatomy of emotional processing biases for masked faces in major depressive disorder.

    Directory of Open Access Journals (Sweden)

    Teresa A Victor

    Full Text Available BACKGROUND: Major depressive disorder (MDD is associated with a mood-congruent processing bias in the amygdala toward face stimuli portraying sad expressions that is evident even when such stimuli are presented below the level of conscious awareness. The extended functional anatomical network that maintains this response bias has not been established, however. AIMS: To identify neural network differences in the hemodynamic response to implicitly presented facial expressions between depressed and healthy control participants. METHOD: Unmedicated-depressed participants with MDD (n=22 and healthy controls (HC; n=25 underwent functional MRI as they viewed face stimuli showing sad, happy or neutral face expressions, presented using a backward masking design. The blood-oxygen-level dependent (BOLD signal was measured to identify regions where the hemodynamic response to the emotionally valenced stimuli differed between groups. RESULTS: The MDD subjects showed greater BOLD responses than the controls to masked-sad versus masked-happy faces in the hippocampus, amygdala and anterior inferotemporal cortex. While viewing both masked-sad and masked-happy faces relative to masked-neutral faces, the depressed subjects showed greater hemodynamic responses than the controls in a network that included the medial and orbital prefrontal cortices and anterior temporal cortex. CONCLUSIONS: Depressed and healthy participants showed distinct hemodynamic responses to masked-sad and masked-happy faces in neural circuits known to support the processing of emotionally valenced stimuli and to integrate the sensory and visceromotor aspects of emotional behavior. Altered function within these networks in MDD may establish and maintain illness-associated differences in the salience of sensory/social stimuli, such that attention is biased toward negative and away from positive stimuli.

  13. Musicians and non-musicians are equally adept at perceiving masked speech

    OpenAIRE

    Boebinger, Dana; Evans, Samuel; Scott, Sophie K.; Rosen, Stuart; Lima, César F.; Manly, Tom

    2015-01-01

    There is much interest in the idea that musicians perform better than non-musicians in understanding speech in background noise. Research in this area has often used energetic maskers, which have their effects primarily at the auditory periphery. However, masking interference can also occur at more central auditory levels, known as informational masking. This experiment extends existing research by using multiple maskers that vary in their informational content and similarity to speech, in or...

  14. The Mysterious Noh Mask: Contribution of Multiple Facial Parts to the Recognition of Emotional Expressions

    OpenAIRE

    Hiromitsu Miyata; Ritsuko Nishimura; Kazuo Okanoya; Nobuyuki Kawai

    2012-01-01

    BACKGROUND: A Noh mask worn by expert actors when performing on a Japanese traditional Noh drama is suggested to convey countless different facial expressions according to different angles of head/body orientation. The present study addressed the question of how different facial parts of a Noh mask, including the eyebrows, the eyes, and the mouth, may contribute to different emotional expressions. Both experimental situations of active creation and passive recognition of emotional facial expr...

  15. A systematic approach for extracting verification patterns from an OPC test mask

    Science.gov (United States)

    Kamel, Mohammad K. A.; Al-Imam, Mohamed

    2012-06-01

    Optical Proximity Correction (OPC) is a crucial step in Semiconductor manufacturing for technology of dimensions below the exposure wavelength. Light from the exposure source is diffracted when passing through mask dimensions below the exposure wavelength causing patterns on wafer to differ from the intent patterns. During OPC the design intent layout patterns are modified to compensate for light diffractions so that the final wafer patterns match the design intent patterns. OPC achieves this by using OPC models that model the optical conditions, resist, and etch behavior; and an OPC recipe that controls the patterns modification process. The OPC models are calibrated from test mask structures that are developed, exposed and measured when starting to set up the manufacturing process. Structures chosen to be placed on the test mask have a great impact on the capability to predict future layout patterns that were not present in the original test mask, referred to as model coverage. Test masks are usually composed of patterns used in model calibration and others used for verifying the calibrated model. In advanced technology nodes, both the feature size and the error budget are being shrunk. Hence to reach the best model coverage with acceptable accuracy, we need to ensure that the test mask contains all the possible structures in the real designs, while maintaining that the number of patterns does not consume long metrology tools time, cause extra overhead cost to the process, or delay the development cycle. This paper presents a systematic approach to optimize the number of patterns to be included in the test mask and split test patterns into calibration and verification patterns. Results from using the proposed method are compared to other methods of splitting that are based either on geometrical or random methods. The approach provided a significant reduction in model calibration time, the number of needed patterns in the test mask, and the total development

  16. Expanding the printable design space for lithography processes utilizing a cut mask

    Science.gov (United States)

    Wandell, Jerome; Salama, Mohamed; Wilkinson, William; Curtice, Mark; Feng, Jui-Hsuan; Gao, Shao Wen; Asthana, Abhishek

    2016-03-01

    The utilization of a cut-mask in semiconductor patterning processes has been in practice for logic devices since the inception of 32nm-node devices, notably with unidirectional gate level printing. However, the microprocessor applications where cut-mask patterning methods are used are expanding as Self-Aligned Double Patterning (SADP) processes become mainstream for 22/14nm fin diffusion, and sub-14nm metal levels. One common weakness for these types of lithography processes is that the initial pattern requiring the follow-up cut-mask typically uses an extreme off-axis imaging source such as dipole to enhance the resolution and line-width roughness (LWR) for critical dense patterns. This source condition suffers from poor process margin in the semi-dense (forbidden pitch) realm and wrong-way directional design spaces. Common pattern failures in these limited design regions include bridging and extra-printing defects that are difficult to resolve with traditional mask improvement means. This forces the device maker to limit the allowable geometries that a designer may use on a device layer. This paper will demonstrate methods to expand the usable design space on dipole-like processes such as unidirectional gate and SADP processes by utilizing the follow-up cut mask to improve the process window. Traditional mask enhancement means for improving the process window in this design realm will be compared to this new cut-mask approach. The unique advantages and disadvantages of the cut-mask solution will be discussed in contrast to those customary methods.

  17. Abnormal auditory forward masking pattern in the brainstem response of individuals with Asperger syndrome

    OpenAIRE

    Källstrand, Johan; Olsson, Olle; Nehlstedt, Sara Fristedt; Ling, Mia; Nielzén, Sören

    2010-01-01

    Abnormal auditory information processing has been reported in individuals with autism spectrum disorders (ASD). In the present study auditory processing was investigated by recording auditory brainstem responses (ABRs) elicited by forward masking in adults diagnosed with Asperger syndrome (AS). Sixteen AS subjects were included in the forward masking experiment and compared to three control groups consisting of healthy individuals (n = 16), schizophrenic patients (n = 16) and attention defici...

  18. Hidden data transmission using time delay for separating useful signals from masking oscillations

    Science.gov (United States)

    Kal'Yanov, Er. V.

    2009-03-01

    A new method of hidden data transmission based on the use of time delay for the separation of useful signals from masking noise-like (chaotic or stochastic) oscillations is described. Mathematical models involving a source of chaotic oscillations have been studied using numerical methods. The transmission of a masked non-encoded signal and the pulsed data transmission using 0/1 bit code are considered.

  19. Altered motivation masks appetitive learning potential of obese mice.

    Science.gov (United States)

    Harb, Mazen R; Almeida, Osborne F X

    2014-01-01

    Eating depends strongly on learning processes which, in turn, depend on motivation. Conditioned learning, where individuals associate environmental cues with receipt of a reward, forms an important part of hedonic mechanisms; the latter contribute to the development of human overweight and obesity by driving excessive eating in what may become a vicious cycle. Although mice are commonly used to explore the regulation of human appetite, it is not known whether their conditioned learning of food rewards varies as a function of body mass. To address this, groups of adult male mice of differing body weights were tested two appetitive conditioning paradigms (pavlovian and operant) as well as in food retrieval and hedonic preference tests in an attempt to dissect the respective roles of learning/motivation and energy state in the regulation of feeding behavior. We found that (i) the rate of pavlovian conditioning to an appetitive reward develops as an inverse function of body weight; (ii) higher body weight associates with increased latency to collect food reward; and (iii) mice with lower body weights are more motivated to work for a food reward, as compared to animals with higher body weights. Interestingly, as compared to controls, overweight and obese mice consumed smaller amounts of palatable foods (isocaloric milk or sucrose, in either the presence or absence of their respective maintenance diets: standard, low fat-high carbohydrate or high fat-high carbohydrate). Notably, however, all groups adjusted their consumption of the different food types, such that their body weight-corrected daily intake of calories remained constant. Thus, overeating in mice does not reflect a reward deficiency syndrome and, in contrast to humans, mice regulate their caloric intake according to metabolic status rather than to the hedonic properties of a particular food. Together, these observations demonstrate that excess weight masks the capacity for appetitive learning in the mouse

  20. Altered motivation masks appetitive learning potential of obese mice

    Directory of Open Access Journals (Sweden)

    Mazen R. Harb

    2014-10-01

    Full Text Available Eating depends strongly on learning processes which, in turn, depend on motivation. Conditioned learning, where individuals associate environmental cues with receipt of a reward, forms an important part of hedonic mechanisms; the latter contribute to the development of human overweight and obesity by driving excessive eating in what may become a vicious cycle. Although mice are commonly used to explore the regulation of human appetite, it is not known whether their conditioned learning of food rewards varies as a function of body mass. To address this, groups of adult male mice of differing body weights were tested two appetitive conditioning paradigms (pavlovian and operant as well as in food retrieval and hedonic preference tests in an attempt to dissect the respective roles of learning/motivation and energy state in the regulation of feeding behavior. We found that i the rate of pavlovian conditioning to an appetitive reward develops as an inverse function of body weight; ii higher body weight associates with increased latency to collect food reward; and iii mice with lower body weights are more motivated to work for a food reward, as compared to animals with higher body weights. Interestingly, as compared to controls, overweight and obese mice consumed smaller amounts of palatable foods (isocaloric milk or sucrose, in either the presence or absence of their respective maintenance diets: standard, low fat-high carbohydrate or high fat-high carbohydrate. Notably, however, all groups adjusted their consumption of the different food types, such that their body weight-corrected daily intake of calories remained constant. Thus, overeating in mice does not reflect a reward deficiency syndrome and, in contrast to humans, mice regulate their caloric intake according to metabolic status rather than to the hedonic properties of a particular food. Together, these observations demonstrate that excess weight masks the capacity for appetitive learning in

  1. Measurement Errors Arising When Using Distances in Microeconometric Modelling and the Individuals’ Position Is Geo-Masked for Confidentiality

    Directory of Open Access Journals (Sweden)

    Giuseppe Arbia

    2015-10-01

    Full Text Available In many microeconometric models we use distances. For instance, in modelling the individual behavior in labor economics or in health studies, the distance from a relevant point of interest (such as a hospital or a workplace is often used as a predictor in a regression framework. However, in order to preserve confidentiality, spatial micro-data are often geo-masked, thus reducing their quality and dramatically distorting the inferential conclusions. In particular in this case, a measurement error is introduced in the independent variable which negatively affects the properties of the estimators. This paper studies these negative effects, discusses their consequences, and suggests possible interpretations and directions to data producers, end users, and practitioners.

  2. MASK: An efficient mechanism to extend inter-domain IP spoofing preventions

    Institute of Scientific and Technical Information of China (English)

    LU XiCheng; L(U) GaoFeng; ZHU PeiDong; CHEN YiJiao

    2008-01-01

    IP spoofing hinders the efficiency of DDoS defenses. While recent proposals of IP spoofing prevention mechanisms are weak at filtering spoofing packets due to the complexity in maintaining source IP spaces and the Iow incentive of deployments.To address this problem, we propose an efficient mechanism to extend the range of inter-domain IP spoofing prevention called MASK. Source MASK nodes inform destination MASK nodes about the source IP spaces and labels of their neighbor Stub-ASes in order to implement the marking and verification of packets towards the Stub-ASes, and limit the number of MASK peers through the propagation of BGP updates so as to reduce the overheads of computing and storing of labels. By utilizing the method of extending the spoofing prevention to Stub-ASes, MASK can not only enlarge the domain of the spoofing prevention service, but also filter spoofing packets in advance. Through analysis and simulations, we demonstrate MASK's accuracy and effectiveness.

  3. TASTE MASKING TECHNOLOGIES: A NOVEL APPROACH FOR THE IMPROVEMENT OF ORGANOLEPTIC PROPERTY OF PHARMACEUTICAL ACTIVE SUBSTANCE

    Directory of Open Access Journals (Sweden)

    Sharma Deepak

    2012-04-01

    Full Text Available Acceptability of any dosage form are mainly depends over its taste i.e. mouth feel. Drug molecule interacts with taste receptor on the tongue to give bitter, sweet or salty taste sensation, when they dissolve in saliva. This sensation of the taste is the result of signal transduction from the receptor organs for taste, commonly known as taste buds. In market, there are numbers of pharmaceutical preparations available in which actives are bitter in taste. The improved palatability in these products has prompted the development of numerous formulations, which improved performance and acceptability. The bitterness of preparation also leads to patient incompliance. So masking of bitterness becomes essential. To overcome this problem, many techniques have been developed to mask the bitter taste of drugs. These techniques are not only mask the bitter taste of drug but also enhance the bioavailability and performance of drug dosage form. It includes adding sugars, flavors, sweeteners, use of lipoproteins, numbing taste buds, granulation, use of adsorbates ,coating drug, microencapsulation, multiple emulsion, viscosity modifier, vesicles and liposomes, prodrug and salt formation, inclusion and molecular complexes, solid dispersion and Ion Exchange Resins (IERs which have been tried by the formulators to mask the unpleasant taste of the bitter drugs. The present review article highlights different technologies of taste masking with respect to dosage form and novel methods of evaluation of taste masking effect.

  4. Enforcement of Mask Rule Compliance in Model-Based OPC'ed Layouts during Data Preparation

    Science.gov (United States)

    Meyer, Dirk H.; Vuletic, Radovan; Seidl, Alexander

    2002-12-01

    Currently available commercial model-based OPC tools do not always generate layouts which are mask rule compliant. Additional processing is required to remove mask rule violations, which are often too numerous for manual patching. Although physical verification tools can be used to remove simple mask rule violations, the results are often unsatisfactory for more complicated geometrical configurations. The subject of this paper is the development and application of a geometrical processing engine that automatically enforces mask rule compliance of the OPC'ed layout. It is designed as an add-on to a physical verification tool. The engine constructs patches, which remove mask rule violations such as notches or width violations. By employing a Mixed Integer Programming (MIP) optimization method, the edges of each patch are placed in a way that avoids secondary violations while modifying the OPC'ed layout as little as possible. A sequence of enforcement steps is applied to the layout to remove all types of mask rule violations. This approach of locally confined minimal layout modifications retains OPC corrections to a maximum amount. This method has been used successfully in production on a variety of DRAM designs for the non-array regions.

  5. Preparation and Evaluation of Cyclodextrin Based Binary Systems for Taste Masking

    Directory of Open Access Journals (Sweden)

    S. T. Birhade

    2010-07-01

    Full Text Available The present study was aimed to investigate the potential of cyclodextrin complexation as an approach for taste masking. For this purpose, Rizatriptan benzoate (RZBT was selected as model drug which is having bitter taste. Taste improvement of drug by β-Cyclodextrin was done by simple complexation approach using physical and kneading mixture methods with various ratios. Taste perception study was carried out in-vitro by spectrophotometrically and in-vivo by gustatory sensation to evaluate the taste masking ability of binary complexation. The optimized taste masking ratio 1:10 of kneading mixture was selected based on bitterness score and characterized by fourier transform infrared spectroscopy (FTIR, differential scanning calorimetry (DSC and X-ray diffractometry (XRD to identify the physicochemical interaction between drug and carrier and its effect on dissolution. In-vitro drug release studies for physical mixture and kneaded system were performed in pH 1.2 and 6.8 buffers. The FTIR, DSC and XRD studies indicated inclusion complexation in physical mixture and kneaded system. Both the binary systems showed effective taste masking and at the same time showed no limiting effect on the drug release. Whereas in comparison; kneading system showed better results. The results conclusively demonstrated effective taste masking by β-Cyclodextrin in both binary systems, which can be utilized as a novel alternative approach for effective taste masking.

  6. AIMS D2DB simulation for DUV and EUV mask inspection

    Science.gov (United States)

    Peng, Danping; Li, Ying; Satake, Masaki; Hu, Peter; Chen, Jerry; Hsu, S. C.; Lai, Rick; Lin, C. S.; Tuo, Laurent C. C.

    2012-02-01

    AIMS™ Die-to-Die (D2D) is widely used in checking the wafer printability of mask defects for DUV lithography. Two AIMS images, a reference and a defect image, are captured and compared with differences larger than certain tolerances identified as real defects. Since two AIMS images are needed, and since AIMS system time is precious, it is desirable to save image search and capture time by simulating reference images from the OPC mask pattern and AIMS optics. This approach is called Die-to-Database (D2DB). Another reason that D2DB is desirable is in single die mask, where the reference image from another die does not exist. This paper presents our approach to simulate AIMS optics and mask 3D effects. Unlike OPC model, whose major concern is predicting printed CD, AIMS D2DB model must produce simulated images that match measured images across the image field. This requires a careful modeling of all effects that impact the final image quality. We present a vector-diffraction theory that is based on solid theoretical foundations and a general formulation of mask model that are applicable to both rigorous Maxwell solver and empirical model that can capture the mask 3D-effects. We demonstrated the validity of our approach by comparing our simulated image with AIMS machine measured images. We also briefly discuss the necessary changes needed to model EUV optics. Simulation is particularly useful while the industry waits for an actinic EUV-AIMS tool.

  7. Optical simulations for fractional fluorine terminated coatings on nanoimprint lithography masks

    Science.gov (United States)

    Seidel, Thomas E.; Goldberg, Alexander; Halls, Mathew D.

    2015-10-01

    Simulations of the optical intensity within Nano Imprint Lithography (NIL) mask features have been made for patterned quartz masks having ultrathin film coatings with different indices of refraction. Fractionally fluorine terminated surfaces, previously proposed for improving the yield of NIL processes, are briefly reviewed. Optical intensity solutions within the feature were obtained using Panoramictech Maxwell solver software for variances in the optical constants of the coating films, aspect ratio, feature size, and wavelength.. The coated masks have conformal surface, higher index of refraction under-layer coating and a fractional terminated fluorine hydrocarbon (FHC) monomolecular layer. The values of optical constants for the FHC layers are unknown, so a range of ad-hoc values were simulated. Optical constants for quartz mask and Al2O3, TiO2 and Si under-layer films are taken from the literature. Wavelengths were varied from 193nm to 365nm. The question of photo-dissociation of the FHC layer for higher energy photons is addressed from first principles, with the result that the F-terminated layers are stable at higher wavelengths. Preliminary simulations for features filled with resist over various substrates are dependent on the antireflection character of the underlying film system. The optical intensity is generally increased within the simulated mask feature when coated with a higher index/FHC films relative to the uncoated reference quartz mask for ~5nm physical feature sizes.

  8. Conceptual design of a hybrid parallel mechanism for mask exchanging of TMT

    Science.gov (United States)

    Wang, Jianping; Zhou, Hongfei; Li, Kexuan; Zhou, Zengxiang; Zhai, Chao

    2015-10-01

    Mask exchange system is an important part of the Multi-Object Broadband Imaging Echellette (MOBIE) on the Thirty Meter Telescope (TMT). To solve the problem of stiffness changing with the gravity vector of the mask exchange system in the MOBIE, the hybrid parallel mechanism design method was introduced into the whole research. By using the characteristics of high stiffness and precision of parallel structure, combined with large moving range of serial structure, a conceptual design of a hybrid parallel mask exchange system based on 3-RPS parallel mechanism was presented. According to the position requirements of the MOBIE, the SolidWorks structure model of the hybrid parallel mask exchange robot was established and the appropriate installation position without interfering with the related components and light path in the MOBIE of TMT was analyzed. Simulation results in SolidWorks suggested that 3-RPS parallel platform had good stiffness property in different gravity vector directions. Furthermore, through the research of the mechanism theory, the inverse kinematics solution of the 3-RPS parallel platform was calculated and the mathematical relationship between the attitude angle of moving platform and the angle of ball-hinges on the moving platform was established, in order to analyze the attitude adjustment ability of the hybrid parallel mask exchange robot. The proposed conceptual design has some guiding significance for the design of mask exchange system of the MOBIE on TMT.

  9. Accurate mask model implementation in OPC model for 14nm nodes and beyond

    Science.gov (United States)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Farys, Vincent; Huguennet, Frederic; Armeanu, Ana-Maria; Bork, Ingo; Chomat, Michael; Buck, Peter; Schanen, Isabelle

    2015-10-01

    In a previous work [1] we demonstrated that current OPC model assuming the mask pattern to be analogous to the designed data is no longer valid. Indeed as depicted in figure 1, an extreme case of line-end shortening shows a gap up to 10 nm difference (at mask level). For that reason an accurate mask model, for a 14nm logic gate level has been calibrated. A model with a total RMS of 1.38nm at mask level was obtained. 2D structures such as line-end shortening and corner rounding were well predicted using SEM pictures overlaid with simulated contours. The first part of this paper is dedicated to the implementation of our improved model in current flow. The improved model consists of a mask model capturing mask process and writing effects and a standard optical and resist model addressing the litho exposure and development effects at wafer level. The second part will focus on results from the comparison of the two models, the new and the regular, as depicted in figure 2.

  10. Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

    Science.gov (United States)

    Zine El Abidine, Nacer; Sundermann, Frank; Yesilada, Emek; Farys, Vincent; Huguennet, Frederic; Armeanu, Ana-Maria; Bork, Ingo; Chomat, Michael; Buck, Peter; Schanen, Isabelle

    2016-04-01

    In a previous work, we demonstrated that the current optical proximity correction model assuming the mask pattern to be analogous to the designed data is no longer valid. An extreme case of line-end shortening shows a gap up to 10 nm difference (at mask level). For that reason, an accurate mask model has been calibrated for a 14-nm logic gate level. A model with a total RMS of 1.38 nm at mask level was obtained. Two-dimensional structures, such as line-end shortening and corner rounding, were well predicted using scanning electron microscopy pictures overlaid with simulated contours. The first part of this paper is dedicated to the implementation of our improved model in current flow. The improved model consists of a mask model capturing mask process and writing effects, and a standard optical and resist model addressing the litho exposure and development effects at wafer level. The second part will focus on results from the comparison of the two models, the new and the regular.

  11. SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

    Science.gov (United States)

    Muckenhirn, Sylvain; Meyyappan, A.; Walch, Kelvin; Maslow, Mark J.; Vandenberghe, Geert; van Wingerden, Johannes

    2001-08-01

    As dimensions get smaller and circuits get more complex, the demand for comprehensive measurements of reticule geometries increases. 3D characterization of phase shift mask (PSM) is required to understand the quality of the transferred image. To avoid anomalies between the measurements, the structures on both mask/reticule and wafer should be measured using the same technique. The technique used should be insensitive to differences in the intrinsic characteristics of the materials (chromium on quartz, resist on conductive or non-conductive layers). Scanning probe microscopy (SPM) is ideally suited to make these characterizations on both masks/reticule and wafers. It quantitatively profiles lines and trenches in three dimensions. SPM is a nondestructive technique, allowing for the preservation of the integrity of mask and wafers. The profiles of features on a phase shift mask (PSM) are measured with SPM. Some undesirable effects such as micro loading versus structure size during quartz etch, positive slope of the quartz sidewall, and CD differential between chromium and quartz are characterized. Some of the corresponding features on the wafer are measured with SPM and the correlation between the mask anomalies and their effect on wafer features are established.

  12. [Affective dependency].

    Science.gov (United States)

    Scantamburlo, G; Pitchot, W; Ansseau, M

    2013-01-01

    Affective dependency is characterized by emotional distress (insecure attachment) and dependency to another person with a low self-esteem and reassurance need. The paper proposes a reflection on the definition of emotional dependency and the confusion caused by various denominations. Overprotective and authoritarian parenting, cultural and socio-environmental factors may contribute to the development of dependent personality. Psychological epigenetic factors, such as early socio-emotional trauma could on neuronal circuits in prefronto-limbic regions that are essential for emotional behaviour.We also focus on the interrelations between dependent personality, domestic violence and addictions. The objective for the clinician is to propose a restoration of self-esteem and therapeutic strategies focused on autonomy. PMID:23888587

  13. [Affective dependency].

    Science.gov (United States)

    Scantamburlo, G; Pitchot, W; Ansseau, M

    2013-01-01

    Affective dependency is characterized by emotional distress (insecure attachment) and dependency to another person with a low self-esteem and reassurance need. The paper proposes a reflection on the definition of emotional dependency and the confusion caused by various denominations. Overprotective and authoritarian parenting, cultural and socio-environmental factors may contribute to the development of dependent personality. Psychological epigenetic factors, such as early socio-emotional trauma could on neuronal circuits in prefronto-limbic regions that are essential for emotional behaviour.We also focus on the interrelations between dependent personality, domestic violence and addictions. The objective for the clinician is to propose a restoration of self-esteem and therapeutic strategies focused on autonomy.

  14. A randomised crossover trial comparing a single-use polyvinyl chloride laryngeal mask airway with a single-use silicone laryngeal mask airway.

    Science.gov (United States)

    Bell, S F; Morris, N G; Rao, A; Wilkes, A R; Goodwin, N

    2012-12-01

    We compared insertion rates of single-use polyvinyl chloride laryngeal mask airways (LMAs) vs single-use silicone LMAs in 72 anaesthetised patients. Both airways were produced by Flexicare Medical. Laryngeal mask airway insertion was successful on the first attempt in 68/72 (94%) polyvinyl chloride LMAs vs 64/72 (89%) silicone LMAs (p = 0.39). Overall insertion rates were 72/72 (100%) for the polyvinyl chloride LMAs and 71/72 (99%) for the silicone LMAs (p = 1.0). Mean (SD) insertion times were similar for polyvinyl chloride and silicone LMAs: 24.3 (5.1)s vs 24.8 (7.8)s (p = 0.64). Laryngeal mask airway position, as assessed using a fibrescope, was not different (p = 0.077). The median (IQR [range]) leak pressure was 16 (12-20 [6-30]) cmH(2) O for the polyvinyl LMA and 18 (13-22 [6-30]) cmH(2) O or the silicone LMA (p = 0.037). In conclusion, we did not find any important differences between polyvinyl chloride and silicone laryngeal mask airways.

  15. Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning

    Science.gov (United States)

    Varghese, Ivin; Bowers, Charles W.; Balooch, Mehdi

    2011-11-01

    Cryogenic CO2 aerosol cleaning being a dry, chemically-inert and residue-free process is used in the production of optical lithography masks. It is an attractive cleaning option for the mask industry to achieve the requirement for removal of all printable soft defects and repair debris down to the 50nm printability specification. In the technique, CO2 clusters are formed by sudden expansion of liquid from high to almost atmospheric pressure through an optimally designed nozzle orifice. They are then directed on to the soft defects or debris for momentum transfer and subsequent damage free removal from the mask substrate. Unlike aggressive acid based wet cleaning, there is no degradation of the mask after processing with CO2, i.e., no critical dimension (CD) change, no transmission/phase losses, or chemical residue that leads to haze formation. Therefore no restriction on number of cleaning cycles is required to be imposed, unlike other cleaning methods. CO2 aerosol cleaning has been implemented for several years as full mask final clean in production environments at several state of the art mask shops. Over the last two years our group reported successful removal of all soft defects without damage to the fragile SRAF features, zero adders (from the cleaning and handling mechanisms) down to a 50nm printability specification. In addition, CO2 aerosol cleaning is being utilized to remove debris from Post-RAVE repair of hard defects in order to achieve the goal of no printable defects. It is expected that CO2 aerosol cleaning can be extended to extreme ultraviolet (EUV) masks. In this paper, we report advances being made in nozzle design qualification for optimum snow properties (size, velocity and flux) using Phase Doppler Anemometry (PDA) technique. In addition the two new areas of focus for CO2 aerosol cleaning i.e. pellicle glue residue removal on optical masks, and ruthenium (Ru) film on EUV masks are presented. Usually, the residue left over after the pellicle

  16. Deflection unit for multi-beam mask making

    Science.gov (United States)

    Letzkus, Florian; Butschke, Joerg; Irmscher, Mathias; Jurisch, Michael; Klingler, Wolfram; Platzgummer, Elmar; Klein, Christof; Loeschner, Hans; Springer, Reinhard

    2008-10-01

    Two main challenges of future mask making are the decreasing throughput of the pattern generators and the insufficient line edge roughness of the resist structures. The increasing design complexity with smaller feature sizes combined with additional pattern elements of the Optical Proximity Correction generates huge data volumes which reduce correspondingly the throughput of conventional single e-beam pattern generators. On the other hand the achievable line edge roughness when using sensitive chemically amplified resists does not fulfill the future requirements. The application of less sensitive resists may provide an improved roughness, however on account of throughput, as well. To overcome this challenge a proton multi-beam pattern generator is developed [1]. Starting with a highly parallel broad beam, an aperture-plate is used to generate thousands of separate spot beams. These beams pass through a blanking-plate unit, based on a CMOS device for de-multiplexing the writing data and equipped with electrodes placed around the apertures switching the beams "on" or "off", dependent on the desired pattern. The beam array is demagnified by a 200x reduction optics and the exposure of the entire substrate is done by a continuous moving stage. One major challenge is the fabrication of the required high aspect deflection electrodes and their connection to the CMOS device. One approach is to combine a post-processed CMOS chip with a MEMS component containing the deflection electrodes and to realize the electrical connection of both by vertical integration techniques. For the evaluation and assessment of this considered scheme and fabrication technique, a proof-of-concept deflection unit has been realized and tested. Our design is based on the generation of the deflection electrodes in a silicon membrane by etching trenches and oxide filling afterwards. In a 5mm x 5mm area 43,000 apertures with the corresponding electrodes have been structured and wired individually or in

  17. Automatic masking for robust 3D-2D image registration in image-guided spine surgery

    Science.gov (United States)

    Ketcha, M. D.; De Silva, T.; Uneri, A.; Kleinszig, G.; Vogt, S.; Wolinsky, J.-P.; Siewerdsen, J. H.

    2016-03-01

    During spinal neurosurgery, patient-specific information, planning, and annotation such as vertebral labels can be mapped from preoperative 3D CT to intraoperative 2D radiographs via image-based 3D-2D registration. Such registration has been shown to provide a potentially valuable means of decision support in target localization as well as quality assurance of the surgical product. However, robust registration can be challenged by mismatch in image content between the preoperative CT and intraoperative radiographs, arising, for example, from anatomical deformation or the presence of surgical tools within the radiograph. In this work, we develop and evaluate methods for automatically mitigating the effect of content mismatch by leveraging the surgical planning data to assign greater weight to anatomical regions known to be reliable for registration and vital to the surgical task while removing problematic regions that are highly deformable or often occluded by surgical tools. We investigated two approaches to assigning variable weight (i.e., "masking") to image content and/or the similarity metric: (1) masking the preoperative 3D CT ("volumetric masking"); and (2) masking within the 2D similarity metric calculation ("projection masking"). The accuracy of registration was evaluated in terms of projection distance error (PDE) in 61 cases selected from an IRB-approved clinical study. The best performing of the masking techniques was found to reduce the rate of gross failure (PDE > 20 mm) from 11.48% to 5.57% in this challenging retrospective data set. These approaches provided robustness to content mismatch and eliminated distinct failure modes of registration. Such improvement was gained without additional workflow and has motivated incorporation of the masking methods within a system under development for prospective clinical studies.

  18. Comparative Evaluation of Mask Production CAR Development Process with Stepwise Defect Inspection

    Science.gov (United States)

    Jeong, Woo-Gun; Lee, Jung-Kwan; Park, Dong-Il; Park, Eu-Sang; Lee, Jong-Hwa; Seo, Sun-Kyu; Lee, Dong-Heok; Kim, Jin-Min; Choi, Sang-Soo; Jeong, Soo-Hong

    2002-12-01

    Chemically amplified resist (CAR) provides superior lithographic performance compared to traditional e-beam resists in production maskmaking. Parameters benefiting the most are contrast, resolution, and sensitivity. In spite of CAR's advantages, defect control and tighter 50KeV e-beam CAR process restrictions are significantly more critical thanks to smaller geometries, tighter CD specifications, and optical proximity correction (OPC) for 90nm node mask technology. Among defect root causes, resist development is considered to be the one of the most important steps because post-development residue can generate printable defects on finished masks. We investigated the CAR development process across different resist development methods, such as binary and fan-type nozzle spin spray, and puddle development. Several high density binary and embedded-attenuated phase shift masks (EAPSMs) with 70% clear area in the main pattern field were evaluated in an effort to identify and contain post-develop defects in a typical mask production flow. Development step process residue was examined at the after-develop inspection (ADI) step and scanning electron microscopy (SEM) was used for individual defect review. The KLA-Tencor SLF77 TeraStar inspection tool was used to inspect patterns after the development, Cr/MoSiON layer dry etch, and clean steps. The effectiveness of the various CAR development methods has been also studied following development, dry etch, and cleaning inspection by using identical binary and EAPSM masks from production. The mechanism and defect source during the stepwise process and inspections were scrutinized and discussed. Experimental results showed that stepwise process inspection was effective in identifying defects and their sources to prevent defects, and in optimizing each process step. It was found that CAR development and dry etch processes are the most important process steps to control defects in CAR-based mask production. Suggested optimized

  19. Dry etched SiO2 Mask for HgCdTe Etching Process

    Science.gov (United States)

    Chen, Y. Y.; Ye, Z. H.; Sun, C. H.; Deng, L. G.; Zhang, S.; Xing, W.; Hu, X. N.; Ding, R. J.; He, L.

    2016-09-01

    A highly anisotropic etching process with low etch-induced damage is indispensable for advanced HgCdTe (MCT) infrared focal plane array (IRFPA) detectors. The inductively coupled plasma (ICP) enhanced reactive ion etching technique has been widely adopted in manufacturing HgCdTe IRFPA devices. An accurately patterned mask with sharp edges is decisive to accomplish pattern duplication. It has been reported by our group that the SiO2 mask functions well in etching HgCdTe with high selectivity. However, the wet process in defining the SiO2 mask is limited by ambiguous edges and nonuniform patterns. In this report, we patterned SiO2 with a mature ICP etching technique, prior to which a thin ZnS film was deposited by thermal evaporation. The SiO2 film etching can be terminated at the auto-stopping point of the ZnS layer thanks to the high selectivity of SiO2/ZnS in SF6 based etchant. Consequently, MCT etching was directly performed without any other treatment. This mask showed acceptable profile due to the maturity of the SiO2 etching process. The well-defined SiO2 pattern and the etched smooth surfaces were investigated with scanning electron microscopy and atomic force microscope. This new mask process could transfer the patterns exactly with very small etch-bias. A cavity with aspect-ratio (AR) of 1.2 and root mean square roughness of 1.77 nm was achieved first, slightly higher AR of 1.67 was also get with better mask profile. This masking process ensures good uniformity and surely benefits the delineation of shrinking pixels with its high resolution.

  20. Inferior alveolar nerve injury with laryngeal mask airway: a case report

    Directory of Open Access Journals (Sweden)

    Masud Sarmad

    2011-03-01

    Full Text Available Abstract Introduction The incidence of damage to the individual cranial nerves and their branches associated with laryngeal mask airway use is low; there have been case reports of damage to the lingual nerve, hypoglossal nerve and recurrent laryngeal nerve. To the best of our knowledge we present the first reported case of inferior alveolar nerve injury associated with laryngeal mask airway use. Case presentation A 35-year-old Caucasian man presented to our facility for elective anterior cruciate ligament repair. He had no background history of any significant medical problems. He opted for general anesthesia over a regional technique. He was induced with fentanyl and propofol and a size 4 laryngeal mask airway was inserted without any problems. His head was in a neutral position during the surgery. After surgery in the recovery room, he complained of numbness in his lower lip. He also developed extensive scabbing of the lower lip on the second day after surgery. The numbness and scabbing started improving after a week, with complete recovery after two weeks. Conclusion We report the first case of vascular occlusion and injury to the inferior alveolar nerve, causing scabbing and numbness of the lower lip, resulting from laryngeal mask airway use. This is an original case report mostly of interest for anesthetists who use the laryngeal mask airway in day-to-day practice. Excessive inflation of the laryngeal mask airway cuff could have led to this complication. Despite the low incidence of cranial nerve injury associated with the use of the laryngeal mask airway, vigilant adherence to evidence-based medicine techniques and recommendations from the manufacturer's instructions can prevent such complications.

  1. Mask-wearing and respiratory infection in healthcare workers in Beijing, China

    Directory of Open Access Journals (Sweden)

    Peng Yang

    2011-04-01

    Full Text Available OBJECTIVES: The aim of the study was to determine rates of mask-wearing, of respiratory infection and the factors associated with mask-wearing and of respiratory infection in healthcare workers (HCWs in Beijing during the winter of 2007/2008. METHODS: We conducted a survey of 400 HCWs working in eight hospitals in Beijing by face to face interview using a standardized questionnaire. RESULTS: We found that 280/400 (70.0% of HCWs were compliant with mask-wearing while in contact with patients. Respiratory infection occurred in 238/400 (59.5% subjects from November, 2007 through February, 2008. Respiratory infection was higher among females (odds ratio [OR], 2.00 [95% confidence interval {CI}, 1.16-3.49] and staff working in larger hospitals (OR, 1.72 [95% CI, 1.092.72], but was lower among subjects with seasonal influenza vaccination (OR, 0.46 [95% CI, 0.280.76], wearing medical masks (reference: cotton-yarn; OR, 0.60 [95% CI, 0.39-0.91] or with good mask-wearing adherence (OR, 0.60 [95% CI, 0.37-0.98]. The risk of respiratory infection of HCWs working in low risk areas was similar to that of HCWs in high risk area. CONCLUSION: Our data suggest that female HCWs and staffs working in larger hospitals are the focus of prevention and control of respiratory infection in Beijing hospitals. Mask-wearing and seasonal influenza vaccination are protective for respiratory infection in HCWs; the protective efficacy of medical masks is better than that of cotton yarn ones; respiratory infection of HCWs working in low risk areas should also be given attention.

  2. Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach

    Energy Technology Data Exchange (ETDEWEB)

    Upadhyaya, Mihir; Jindal, Vibhu; Basavalingappa, Adarsh; Herbol, Henry; Harris-Jones, Jenah; Jang, Il-Yong; Goldberg, Kenneth A.; Mochi, Iacopo; Marokkey, Sajan; Demmerle, Wolfgang; Pistor, Thomas V.; Denbeaux, Gregory

    2015-03-16

    The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the printability of the native EUV mask defects. In this work, we performed a systematic study of native mask defects to understand the defect printability caused by them. The multilayer growth over native substrate mask blank defects was correlated to the multilayer growth over regular-shaped defects having similar profiles in terms of their width and height. To model the multilayer growth over the defects, a novel level-set multilayer growth model was used that took into account the tool deposition conditions of the Veeco Nexus ion beam deposition tool. The same tool was used for performing the actual deposition of the multilayer stack over the characterized native defects, thus ensuring a fair comparison between the actual multilayer growth over native defects, and modeled multilayer growth over regular-shaped defects. Further, the printability of the characterized native defects was studied with the SEMATECH-Berkeley Actinic Inspection Tool (AIT), an EUV mask-imaging microscope at Lawrence Berkeley National Laboratory (LBNL). Printability of the modeled regular-shaped defects, which were propagated up the multilayer stack using level-set growth model was studied using defect printability simulations implementing the waveguide algorithm. Good comparison was observed between AIT and the simulation results, thus demonstrating that multilayer growth over a defect is primarily a function of a defect’s width and height, irrespective of its shape. This would allow us to predict printability of the arbitrarily-shaped native EUV mask defects in a systematic and robust manner.

  3. Exploring the impact of mask making constraints on double patterning design rules

    Science.gov (United States)

    Dam, Thuc; Sinn, Robert; Rissman, Paul; Gleason, Bob

    2011-11-01

    In order to achieve an economical design-to-mask (DTM) development cycle in the low k1 domain, designers, lithographers, and mask makers needed to move away from many sequentially isolated developmental activities onto one collaborative environment managed by a computational lithography platform that integrates their respective ecosystems. 1,2 A successful development cycle used to be achievable by designers providing designs to lithographers, who then provided RET/OPC solutions to realize designs, but once k1 fell below a certain level, the lithographers could not provide solutions to realize some critical designs, which then required feedback to designers for further redesigns requiring further lithographic evaluation cycles. So collaboration and automations between lithographers and designers became necessary to reduce feedback loops and development cycle time. RET and design solutions also were impacted by mask making, and so mask maker's feedback on MRC and other constraints needed to be integrated for all three groups to achieve an economical DTM. As many lithographers attempted to print sub-80 nm pitches with 193 nm wavelength, it became necessary to use double patterning to achieve feature resolution. With the effective pitch doubling on each split layer, there could be significant increased design rule freedom for certain complex design situations. Using an integrated computational lithographic platform, one could find design space sweet spots that could further achieve optimal lithographic performance. In this paper, the optimization of design rules (DRD) for double pattern designs (~60 nm pitch) was explored with the mask maker's perspective. The experiment to be presented started with a 2x nm design set of clips. Each set of clips underwent size/width/space/pitch variations to generate a design space, and then each design space underwent SMO with an inverse lithography technology (ILT) engine using various mask MRC's and manhattan segmentations. The

  4. Masked syllable priming effects in word and picture naming in Chinese.

    Directory of Open Access Journals (Sweden)

    Wenping You

    Full Text Available Four experiments investigated the role of the syllable in Chinese spoken word production. Chen, Chen and Ferrand (2003 reported a syllable priming effect when primes and targets shared the first syllable using a masked priming paradigm in Chinese. Our Experiment 1 was a direct replication of Chen et al.'s (2003 Experiment 3 employing CV (e.g., ,/ba2.ying2/, strike camp and CVG (e.g., ,/bai2.shou3/, white haired syllable types. Experiment 2 tested the syllable priming effect using different syllable types: e.g., CV (,/qi4.qiu2/, balloon and CVN (,/qing1.ting2/, dragonfly. Experiment 3 investigated this issue further using line drawings of common objects as targets that were preceded either by a CV (e.g., ,/qi3/, attempt, or a CVN (e.g., ,/qing2/, affection prime. Experiment 4 further examined the priming effect by a comparison between CV or CVN priming and an unrelated priming condition using CV-NX (e.g., ,/mi2.ni3/, mini and CVN-CX (e.g., ,/min2.ju1/, dwellings as target words. These four experiments consistently found that CV targets were named faster when preceded by CV primes than when they were preceded by CVG, CVN or unrelated primes, whereas CVG or CVN targets showed the reverse pattern. These results indicate that the priming effect critically depends on the match between the structure of the prime and that of the first syllable of the target. The effect obtained in this study was consistent across different stimuli and different tasks (word and picture naming, and provides more conclusive and consistent data regarding the role of the syllable in Chinese speech production.

  5. How does real affect affect affect recognition in speech?

    NARCIS (Netherlands)

    Truong, Khiet Phuong

    2009-01-01

    The aim of the research described in this thesis was to develop speech-based affect recognition systems that can deal with spontaneous (‘real’) affect instead of acted affect. Several affect recognition experiments with spontaneous affective speech data were carried out to investigate what combinati

  6. Penetration of diesel exhaust particles through commercially available dust half masks.

    Science.gov (United States)

    Penconek, Agata; Drążyk, Paulina; Moskal, Arkadiusz

    2013-04-01

    Half masks are certified by the competent, national institutions--National Institute for Occupational Safety and Health (NIOSH) in the USA and the respective European national institutions applying common European regulations. However, certification testing is conducted with particles of NaCl, paraffin oil, or dioctyl phthalate (DOP) and at the constant flow rate, whereas particles commonly found in workplaces may differ in size, shape, and morphology from these particles. Therefore, the aim of this study was to investigate filtration efficiency of commercially available filtering facepiece half masks under the condition of exposure to diesel fumes. In this study, we focused on the particulate phase [diesel exhaust particles (DEP)] of three (petroleum diesel, ecodiesel, and biodiesel) diesel fuel combustion types. Two types of European standard-certified half masks, FFP2 and FFP - Filtering Facepiece, and three types of popular diesel fuels were tested. The study showed that the filtration efficiencies for each examined half mask and for each of diesel exhaust fumes were lower than the minimum filtration efficiency required for the standard test aerosols by the European standards. For FFP2 and FFP3 particulate half masks, standard minimum filtration efficiency is 94 and 99%, respectively, whereas 84-89% of mass of DEP from various fuels were filtered by the tested FFP2 and only 75-86% by the FFP3. The study indicated that DEP is more penetrating for these filters than the standard salt or paraffin oil test aerosols. The study also showed that the most penetrating DEP are probably in the 30- to 300-nm size range, regardless of the fuel type and the half-mask model. Finally, the pressure drops across both half masks during the 80-min tests remained below an acceptable maximum of breathing resistance-regardless of the fuel types. The respiratory system, during 40-min test exposures, may be exposed to 12-16mg of DEP if a FFP2 or FFP3 particulate half mask is used. To

  7. PMJ panel discussion overview on mask complexities, cost, and cycle time in 32-nm system LSI generation: conflict or concurrent?

    Science.gov (United States)

    Hosono, Kunihiro; Kato, Kokoro

    2008-10-01

    This is a report on a panel discussion organized in Photomask Japan 2008, where the challenges about "Mask Complexities, Cost, and Cycle Time in 32-nm System LSI Generation" were addressed to have a look over the possible solutions from the standpoints of chipmaker, commercial mask shop, DA tool vendor and equipments makers. The wrap-up is as follows: Mask complexities justify the mask cost, while the acceptable increase rate of 32nm-mask cost significantly differs between mask suppliers or users side. The efficiency progress by new tools or DFM has driven their cycle-time reductions. Mask complexities and cost will be crucial issues prior to cycle time, and there seems to be linear correlation between them. Controlling complexity and cycle time requires developing a mix of advanced technologies, and especially for cost reduction, shot prices in writers and processing rates in inspection tools have been improved remarkably by tool makers. In addition, activities of consortium in Japan (Mask D2I) are expected to enhance the total optimization of mask design, writing and inspection. The cycle-time reduction potentially drives the lowering of mask cost, and, on the other, the pattern complexities and tighter mask specifications get in the way to 32nm generation as well as the nano-economics and market challenges. There are still many difficult problems in mask manufacturing now, and we are sure to go ahead to overcome a 32nm hurdle with the advances of technologies and collaborations by not only technologies but also finance.

  8. Occurrence of Features of Fiber Bragg Grating Spectra Having a Wavelength Corresponding to the Phase Mask Periodicity

    Institute of Scientific and Technical Information of China (English)

    Sui P. Yam; Zourab Brodzeli; Scott A. Wade; Greg W. Baxter; Stephen F. Collins

    2008-01-01

    The use of a phase mask with 536 nm uniform pitch allowed the fabrication of a fiber Bragg grating for use at a Bragg wavelength of 785 nm. Reflection and transmission features at 1552 nm, twice the Bragg wavelength, associated with the phase mask periodicity were observed. However, when phase mask orders other than ±1 were absent during fabrication the features at 1552 nm were not evident.

  9. Contact lens wear with the USAF protective integrated hood/mask chemical defense ensemble

    Energy Technology Data Exchange (ETDEWEB)

    Dennis, R.J.; Miller, R.E. II; Peterson, R.D.; Jackson, W.G. Jr. (USAF, Armstrong Laboratory, Brooks AFB, TX (United States))

    1992-07-01

    The Protective Integrated Hood/Mask (PIHM) chemical defense aircrew ensemble blows air from the mask's plenum across the visor at a rate of approximately 15 L/min in order to prevent fogging of the visor and to cool the aircrew member's face. This study was designed to determine the effect of the PIHM airflow on soft contact lens (SCL) dehydration, contact lens comfort, and corneal integrity. There were 26 subjects who participated in this study: 15 SCL wearers, six rigid gas-permeable (RGP) wearers, and five nonspectacle wearing controls. Contrast acuity with the three Regan charts, subjective comfort, and relative humidity (RH) and temperature readings under the PIHM mask were monitored every 0.5 h during 6-h laboratory rides. Slit-lamp examinations and SCL water content measurements with a hand-held Abbe refractometer were made before and after the rides. High RH under the mask may have accounted for the moderate SCL dehydration (8.3 percent), no decrease in contrast acuity for any group, and lack of corneal stress. Although all groups experienced some inferior, epithelial, punctate keratopathy, RGP wearers had the most significant effects. SCLs performed relatively well in the PIHM mask environment. Testing with other parameter designs is necessary before recommending RGPs with the PIHM system. 19 refs.

  10. Comparative evaluation of intraocular pressure changes subsequent to insertion of laryngeal mask airway and endotracheal tube.

    Directory of Open Access Journals (Sweden)

    Ghai B

    2001-07-01

    Full Text Available AIMS: To evaluate the intraocular pressure and haemodynamic changes subsequent to insertion of laryngeal mask airway and endotracheal tube. SUBJECTS AND METHODS: The study was conducted in 50 adult patients. A standard general anaesthesia was administered to all the patients. After 3 minutes of induction of anaesthesia baseline measurements of heart rate, non-invasive blood pressure and intraocular pressure were taken following which patients were divided into two groups: laryngeal mask airway was inserted in group 1 and tracheal tube in group 2. These measurements were repeated at 15-30 second, every minute thereafter up to 5 minutes after airway instrumentation. RESULTS: A statistically significant rise in heart rate, systolic blood pressure, diastolic blood pressure and intraocular pressure was seen in both the groups subsequent to insertion of laryngeal mask airway or endotracheal tube. Mean maximum increase was statistically more after endotracheal intubation than after laryngeal mask airway insertion. The duration of statistically significant pressure responses was also longer after endotracheal intubation. CONCLUSION: Laryngeal mask airway is an acceptable alternative technique for ocular surgeries, offering advantages in terms of intraocular pressure and cardiovascular stability compared to tracheal intubation.

  11. The effect of overlap-masking on binaural reverberant word intelligibility

    Science.gov (United States)

    Libbey, Brad; Rogers, Peter H.

    2004-11-01

    Reverberation interferes with the ability to understand speech in rooms. Overlap-masking explains this degradation by assuming reverberant phonemes endure in time and mask subsequent reverberant phonemes. Most listeners benefit from binaural listening when reverberation exists, indicating that the listener's binaural system processes the two channels to reduce the reverberation. This paper investigates the hypothesis that the binaural word intelligibility advantage found in reverberation is a result of binaural overlap-masking release with the reverberation acting as masking noise. The tests utilize phonetically balanced word lists (ANSI-S3.2 1989), that are presented diotically and binaurally with recorded reverberation and reverberation-like noise. A small room, 62 m3, reverberates the words. These are recorded using two microphones without additional noise sources. The reverberation-like noise is a modified form of these recordings and has a similar spectral content. It does not contain binaural localization cues due to a phase randomization procedure. Listening to the reverberant words binaurally improves the intelligibility by 6.0% over diotic listening. The binaural intelligibility advantage for reverberation-like noise is only 2.6%. This indicates that binaural overlap-masking release is insufficient to explain the entire binaural word intelligibility advantage in reverberation. .

  12. Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

    DEFF Research Database (Denmark)

    Berini, Abadal Gabriel; Boisen, Anja; Davis, Zachary James;

    1999-01-01

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromecha......A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production...... of nanoelectromechanical systems (NEMS) by reactive ion etching. In particular, the laser-modified areas can be subsequently locally oxidized by AFM and the oxidized regions can be selectively removed by chemical etching. This provides a straightforward means to define the overall conducting structure of a device by laser...... writing, and to perform submicron modifications by AFM oxidation. The mask fabrication for a nanoscale suspended resonator bridge is used to illustrate the advantages of this combined technique for NEMS. (C) 1999 American Institute of Physics. [S0003-6951(99)00221-1]....

  13. Effectiveness of mask ventilation performed by hospital doctors in an Irish tertiary referral teaching hospital.

    LENUS (Irish Health Repository)

    Walsh, K

    2012-02-03

    The objective of this study was to assess the effectiveness of mask ventilation performed by 112 doctors with clinical responsibilities at a tertiary referral teaching hospital. Participant doctors were asked to perform mask ventilation for three minutes on a Resusci Anne mannequin using a facemask and a two litre self inflating bag. The tidal volumes generated were quantified using a Laerdal skillmeter computer as grades 0-5, corresponding to 0, 334, 434, 561, 673 and > 800 ml respectively. The effectiveness of mask ventilation (i.e. the proportion of ventilation attempts which achieved a volume delivery of > 434 mls) was greater for anaesthetists [78.0 (29.5)%] than for non anaesthetists [54.6 (40.0)%] (P = 0.012). Doctors who had attended one or more resuscitation courses where no more effective at mask ventilation than their colleagues who had not undertaken such courses. It is likely that first responders to in-hospital cardiac arrests are commonly unable to perform adequate mask ventilation.

  14. Serial robot for the trajectory optimization and error compensation of TMT mask exchange system

    Science.gov (United States)

    Wang, Jianping; Zhang, Feifan; Zhou, Zengxiang; Zhai, Chao

    2015-10-01

    Mask exchange system is the main part of Multi-Object Broadband Imaging Echellette (MOBIE) on the Thirty Meter Telescope (TMT). According to the conception of the TMT mask exchange system, the pre-design was introduced in the paper which was based on IRB 140 robot. The stiffness model of IRB 140 in SolidWorks was analyzed under different gravity vectors for further error compensation. In order to find the right location and path planning, the robot and the mask cassette model was imported into MOBIE model to perform different schemes simulation. And obtained the initial installation position and routing. Based on these initial parameters, IRB 140 robot was operated to simulate the path and estimate the mask exchange time. Meanwhile, MATLAB and ADAMS software were used to perform simulation analysis and optimize the route to acquire the kinematics parameters and compare with the experiment results. After simulation and experimental research mentioned in the paper, the theoretical reference was acquired which could high efficient improve the structure of the mask exchange system parameters optimization of the path and precision of the robot position.

  15. Laboratory demonstration of an optical vortex mask coronagraph using photonic crystal

    Science.gov (United States)

    Murakami, N.; Baba, N.; Ise, A.; Sakamoto, M.; Oka, K.

    2010-10-01

    Photonic crystal, artificial periodic nanostructure, is an attractive device for constructing focal-plane phase-mask coronagraphs such as segmented phase masks (four-quadrant, eight-octant, and 4N-segmented ones) and an optical vortex mask (OVM), because of its extremely small manufacturing defect. Recently, speckle-noise limited contrast has been demonstrated for two monochromatic lasers by using the eight-octant phase-mask made of the photonic crystal (Murakami et al. 2010, ApJ, 714, 772). We applied the photonic-crystal device to the OVM coronagraph. The OVM is more advantageous over the segmented phase masks because it does not have discontinuities other than a central singular point and provides a full on-sky field of view. For generating an achromatic optical vortex, we manufactured an axially-symmetric half-wave plate (ASHWP). It is expected that a size of the manufacturing defect due to the central singularity is an order of several hundreds nanometers. The ASHWP is placed between two circular polarizers for modulating a Pancharatnam phase. A continuous spiral phase modulation is then implemented achromatically. We carried out preliminary laboratory demonstration of the OVM coronagraph using two monochromatic lasers as a model star (wavelengths of 532 nm and 633 nm). We report a principle of the achromatic optical-vortex generation, and results of the laboratory demonstration of the OVM coronagraph.

  16. Protein contamination of the Laryngeal Mask Airway and its relationship to re-use.

    Science.gov (United States)

    Greenwood, J; Green, N; Power, G

    2006-06-01

    The Laryngeal Mask Airway is a reusable device for maintaining the patency of a patient's airway during general anaesthesia. The device can be reused after it has been cleaned and sterilized. Protein contamination of medical instruments is a concern and has been found to occur despite standard sterilization techniques. The reason for the concern relates to the possibility of the transmission of prions and the risk of developing a neurodegenerative disorder such as Creutzveldt-Jacob disease. The purpose of this study was to quantify the amount of protein contamination that occurs, and to relate this to the number of times the Laryngeal Mask Airway has been used. Fifty previously used Classic Laryngeal Masks were collected after routine sterilization and packaging. The devices were immersed in protein detecting stain and then visual inspection performed to assess the degree and distribution of the staining. The researcher was blinded to the number of times the Laryngeal Mask Airway had been used. Linear regression analysis of the degrees of staining of the airway revealed that protein contamination occurs after the first use of the device and this increases with each subsequent use. This finding highlights the concern that the currently used cleaning and sterilization methods do not prevent the accumulation of proteinaceous material on Laryngeal Mask Airways. Consideration should be given to the search for more efficient cleaning and sterilization techniques or the use of disposable devices. PMID:16802488

  17. Vibrotactile masking experiments reveal accelerated somatosensory processing in congenitally blind braille readers.

    Science.gov (United States)

    Bhattacharjee, Arindam; Ye, Amanda J; Lisak, Joy A; Vargas, Maria G; Goldreich, Daniel

    2010-10-27

    Braille reading is a demanding task that requires the identification of rapidly varying tactile patterns. During proficient reading, neighboring characters impact the fingertip at ∼100 ms intervals, and adjacent raised dots within a character at 50 ms intervals. Because the brain requires time to interpret afferent sensorineural activity, among other reasons, tactile stimuli separated by such short temporal intervals pose a challenge to perception. How, then, do proficient Braille readers successfully interpret inputs arising from their fingertips at such rapid rates? We hypothesized that somatosensory perceptual consolidation occurs more rapidly in proficient Braille readers. If so, Braille readers should outperform sighted participants on masking tasks, which demand rapid perceptual processing, but would not necessarily outperform the sighted on tests of simple vibrotactile sensitivity. To investigate, we conducted two-interval forced-choice vibrotactile detection, amplitude discrimination, and masking tasks on the index fingertips of 89 sighted and 57 profoundly blind humans. Sighted and blind participants had similar unmasked detection (25 ms target tap) and amplitude discrimination (compared with 100 μm reference tap) thresholds, but congenitally blind Braille readers, the fastest readers among the blind participants, exhibited significantly less masking than the sighted (masker, 50 Hz, 50 μm; target-masker delays, ±50 and ±100 ms). Indeed, Braille reading speed correlated significantly and specifically with masking task performance, and in particular with the backward masking decay time constant. We conclude that vibrotactile sensitivity is unchanged but that perceptual processing is accelerated in congenitally blind Braille readers.

  18. Informational masking of speech produced by speech-like sounds without linguistic content.

    Science.gov (United States)

    Chen, Jing; Li, Huahui; Li, Liang; Wu, Xihong; Moore, Brian C J

    2012-04-01

    This study investigated whether speech-like maskers without linguistic content produce informational masking of speech. The target stimuli were nonsense Chinese Mandarin sentences. In experiment I, the masker contained harmonics the fundamental frequency (F0) of which was sinusoidally modulated and the mean F0 of which was varied. The magnitude of informational masking was evaluated by measuring the change in intelligibility (releasing effect) produced by inducing a perceived spatial separation of the target speech and masker via the precedence effect. The releasing effect was small and was only clear when the target and masker had the same mean F0, suggesting that informational masking was small. Performance with the harmonic maskers was better than with a steady speech-shaped noise (SSN) masker. In experiments II and III, the maskers were speech-like synthesized signals, alternating between segments with harmonic structure and segments composed of SSN. Performance was much worse than for experiment I, and worse than when an SSN masker was used, suggesting that substantial informational masking occurred. The similarity of the F0 contours of the target and masker had little effect. The informational masking effect was not influenced by whether or not the noise-like segments of the masker were synchronous with the unvoiced segments of the target speech. PMID:22501069

  19. Impact of EUVL mask surface roughness on an actinic blank inspection image and a wafer image

    Science.gov (United States)

    Yamane, Takeshi; Terasawa, Tsuneo

    2012-11-01

    An impact of EUVL mask surface roughness on actinic inspection was studied. The background level (BGL) of an actinic inspection image is caused by the light scattered from the mask blank surface roughness. The BGL is found to be proportional to the square of the mask surface roughness measured by AFM. By using this proportionality coefficient, a global distribution of the surface roughness can be obtained at the same time while inspection a mask. On the other hand, any local variation of BGL indicates variation of the mask surface roughness at each pixel. Assuming that the roughness at a center pixel is 0.15 nm rms (SEMI standard specification) and those at the surrounding pixels are 0.1 nm rms, the signal intensity at the center pixel is found to be approximately the same as that of a 1.2 nm-high and 40 nm-wide programmed defect. In that case, CD error on a wafer image due to the reflectivity loss by the roughness is found to be not critical. This means that the local roughness should be less than 0.15 nm rms, and that the inspection system can detect such a local variation of the roughness with 100 % probability.

  20. Considering mask pellicle effect for more accurate OPC model at 45nm technology node

    Science.gov (United States)

    Wang, Ching-Heng; Liu, Qingwei; Zhang, Liguo

    2008-11-01

    Now it comes to the 45nm technology node, which should be the first generation of the immersion micro-lithography. And the brand-new lithography tool makes many optical effects, which can be ignored at 90nm and 65nm nodes, now have significant impact on the pattern transmission process from design to silicon. Among all the effects, one that needs to be pay attention to is the mask pellicle effect's impact on the critical dimension variation. With the implement of hyper-NA lithography tools, light transmits the mask pellicle vertically is not a good approximation now, and the image blurring induced by the mask pellicle should be taken into account in the computational microlithography. In this works, we investigate how the mask pellicle impacts the accuracy of the OPC model. And we will show that considering the extremely tight critical dimension control spec for 45nm generation node, to take the mask pellicle effect into the OPC model now becomes necessary.

  1. Contact lens wear with the USAF Protective Integrated Hood/Mask chemical defense ensemble.

    Science.gov (United States)

    Dennis, R J; Miller, R E; Peterson, R D; Jackson, W G

    1992-07-01

    The Protective Integrated Hood/Mask (PIHM) chemical defense aircrew ensemble blows air from the mask's plenum across the visor at a rate of approximately 15 L/min in order to prevent fogging of the visor and to cool the aircrew member's face. This study was designed to determine the effect of the PIHM airflow on soft contact lens (SCL) dehydration, contact lens comfort, and corneal integrity. There were 26 subjects who participated in this study: 15 SCL wearers, 6 rigid gas-permeable (RGP) wearers, and 5 nonspectacle wearing controls. Contrast acuity with the 3 Regan charts, subjective comfort, and relative humidity (RH) and temperature readings under the PIHM mask were monitored every 0.5 h during 6-h laboratory rides. Slit-lamp examinations and SCL water content measurements with a hand-held Abbe refractometer were made before and after the rides. High RH under the mask may have accounted for the moderate SCL dehydration (8.3%), no decrease in contrast acuity for any group, and lack of corneal stress. Although all groups experienced some inferior, epithelial, punctate keratopathy, RGP wearers had the most significant. SCLs performed relatively well in the PIHM mask environment. Testing with other parameter designs is necessary before recommending RGPs with the PIHM system. PMID:1616430

  2. Abnormal auditory forward masking pattern in the brainstem response of individuals with Asperger syndrome

    Directory of Open Access Journals (Sweden)

    Johan Källstrand

    2010-05-01

    Full Text Available Johan Källstrand1, Olle Olsson2, Sara Fristedt Nehlstedt1, Mia Ling Sköld1, Sören Nielzén21SensoDetect AB, Lund, Sweden; 2Department of Clinical Neuroscience, Section of Psychiatry, Lund University, Lund, SwedenAbstract: Abnormal auditory information processing has been reported in individuals with autism spectrum disorders (ASD. In the present study auditory processing was investigated by recording auditory brainstem responses (ABRs elicited by forward masking in adults diagnosed with Asperger syndrome (AS. Sixteen AS subjects were included in the forward masking experiment and compared to three control groups consisting of healthy individuals (n = 16, schizophrenic patients (n = 16 and attention deficit hyperactivity disorder patients (n = 16, respectively, of matching age and gender. The results showed that the AS subjects exhibited abnormally low activity in the early part of their ABRs that distinctly separated them from the three control groups. Specifically, wave III amplitudes were significantly lower in the AS group than for all the control groups in the forward masking condition (P < 0.005, which was not the case in the baseline condition. Thus, electrophysiological measurements of ABRs to complex sound stimuli (eg, forward masking may lead to a better understanding of the underlying neurophysiology of AS. Future studies may further point to specific ABR characteristics in AS individuals that separate them from individuals diagnosed with other neurodevelopmental diseases.Keywords: asperger syndrome, auditory brainstem response, forward masking, psychoacoustics

  3. A data preprocessing strategy for metabolomics to reduce the mask effect in data analysis.

    Science.gov (United States)

    Yang, Jun; Zhao, Xinjie; Lu, Xin; Lin, Xiaohui; Xu, Guowang

    2015-01-01

    HighlightsDeveloped a data preprocessing strategy to cope with missing values and mask effects in data analysis from high variation of abundant metabolites.A new method- 'x-VAST' was developed to amend the measurement deviation enlargement.Applying the above strategy, several low abundant masked differential metabolites were rescued. Metabolomics is a booming research field. Its success highly relies on the discovery of differential metabolites by comparing different data sets (for example, patients vs. controls). One of the challenges is that differences of the low abundant metabolites between groups are often masked by the high variation of abundant metabolites. In order to solve this challenge, a novel data preprocessing strategy consisting of three steps was proposed in this study. In step 1, a 'modified 80%' rule was used to reduce effect of missing values; in step 2, unit-variance and Pareto scaling methods were used to reduce the mask effect from the abundant metabolites. In step 3, in order to fix the adverse effect of scaling, stability information of the variables deduced from intensity information and the class information, was used to assign suitable weights to the variables. When applying to an LC/MS based metabolomics dataset from chronic hepatitis B patients study and two simulated datasets, the mask effect was found to be partially eliminated and several new low abundant differential metabolites were rescued.

  4. A Patch-Based Structural Masking Model with an Application to Compression

    Directory of Open Access Journals (Sweden)

    Damon M. Chandler

    2009-01-01

    Full Text Available The ability of an image region to hide or mask a given target signal continues to play a key role in the design of numerous image processing and vision systems. However, current state-of-the-art models of visual masking have been optimized for artificial targets placed upon unnatural backgrounds. In this paper, we (1 measure the ability of natural-image patches in masking distortion; (2 analyze the performance of a widely accepted standard masking model in predicting these data; and (3 report optimal model parameters for different patch types (textures, structures, and edges. Our results reveal that the standard model of masking does not generalize across image type; rather, a proper model should be coupled with a classification scheme which can adapt the model parameters based on the type of content contained in local image patches. The utility of this adaptive approach is demonstrated via a spatially adaptive compression algorithm which employs patch-based classification. Despite the addition of extra side information and the high degree of spatial adaptivity, this approach yields an efficient wavelet compression strategy that can be combined with very accurate rate-control procedures.

  5. A Patch-Based Structural Masking Model with an Application to Compression

    Directory of Open Access Journals (Sweden)

    Gaubatz MatthewD

    2009-01-01

    Full Text Available Abstract The ability of an image region to hide or mask a given target signal continues to play a key role in the design of numerous image processing and vision systems. However, current state-of-the-art models of visual masking have been optimized for artificial targets placed upon unnatural backgrounds. In this paper, we (1 measure the ability of natural-image patches in masking distortion; (2 analyze the performance of a widely accepted standard masking model in predicting these data; and (3 report optimal model parameters for different patch types (textures, structures, and edges. Our results reveal that the standard model of masking does not generalize across image type; rather, a proper model should be coupled with a classification scheme which can adapt the model parameters based on the type of content contained in local image patches. The utility of this adaptive approach is demonstrated via a spatially adaptive compression algorithm which employs patch-based classification. Despite the addition of extra side information and the high degree of spatial adaptivity, this approach yields an efficient wavelet compression strategy that can be combined with very accurate rate-control procedures.

  6. The chronometry of visual perception: review of occipital TMS masking studies.

    Science.gov (United States)

    de Graaf, Tom A; Koivisto, Mika; Jacobs, Christianne; Sack, Alexander T

    2014-09-01

    Transcranial magnetic stimulation (TMS) continues to deliver on its promise as a research tool. In this review article we focus on the application of TMS to early visual cortex (V1, V2, V3) in studies of visual perception and visual awareness. Depending on the asynchrony between visual stimulus onset and TMS pulse (SOA), TMS can suppress visual perception, allowing one to track the time course of functional relevance (chronometry) of early visual cortex for vision. This procedure has revealed multiple masking effects ('dips'), some consistently (∼+100ms SOA) but others less so (∼-50ms, ∼-20ms, ∼+30ms, ∼+200ms SOA). We review the state of TMS masking research, focusing on the evidence for these multiple dips, the relevance of several experimental parameters to the obtained 'masking curve', and the use of multiple measures of visual processing (subjective measures of awareness, objective discrimination tasks, priming effects). Lastly, we consider possible future directions for this field. We conclude that while TMS masking has yielded many fundamental insights into the chronometry of visual perception already, much remains unknown. Not only are there several temporal windows when TMS pulses can induce visual suppression, even the well-established 'classical' masking effect (∼+100ms) may reflect more than one functional visual process.

  7. Incidence of epileptiform EEG activity in children during mask induction of anaesthesia with brief administration of 8% sevoflurane.

    Directory of Open Access Journals (Sweden)

    Barbara Schultz

    Full Text Available BACKGROUND: A high incidence of epileptiform activity in the electroencephalogram (EEG was reported in children undergoing mask induction of anaesthesia with administration of high doses of sevoflurane for 5 minutes and longer. This study was performed to investigate whether reducing the time of exposure to a high inhaled sevoflurane concentration would affect the incidence of epileptiform EEG activity. It was hypothesized that no epileptiform activity would occur, when the inhaled sevoflurane concentration would be reduced from 8% to 4% immediately after the loss of consciousness. METHODOLOGY/PRINCIPAL FINDINGS: 70 children (age 7-96 months, ASA I-II, premedication with midazolam were anaesthetized with 8% sevoflurane in 100% oxygen via face mask. Immediately after loss of consciousness, the sevoflurane concentration was reduced to 4%. EEGs were recorded continuously and were later analyzed visually with regard to epileptiform EEG patterns. Sevoflurane at a concentration of 8% was given for 1.2 ± 0.4 min (mean ± SD. In 14 children (20% epileptiform EEG patterns without motor manifestations were observed (delta with spikes (DSP, rhythmic polyspikes (PSR, epileptiform discharges (PED in 10, 10, 4 children (14%, 14%, 6%. 38 children (54% had slow, rhythmic delta waves with high amplitudes (DS appearing on average before DSP. CONCLUSIONS/SIGNIFICANCE: The hypothesis that no epileptiform potentials would occur during induction of anaesthesia with a reduction of the inspired sevoflurane concentration from 8% to 4% directly after LOC was not proved. Even if 8% sevoflurane is administered only briefly for induction of anaesthesia, epileptiform EEG activity may be observed in children despite premedication with midazolam.

  8. Neonatal resuscitation 1: a model to measure inspired and expired tidal volumes and assess leakage at the face mask

    Science.gov (United States)

    O'Donnell, C; Kamlin, C; Davis, P; Morley, C

    2005-01-01

    Background: Neonatal resuscitation is a common and important intervention, and adequate ventilation is the key to success. In the delivery room, positive pressure ventilation is given with manual ventilation devices using face masks. Mannequins are widely used to teach and practise this technique. During both simulated and real neonatal resuscitation, chest excursion is used to assess tidal volume delivery, and leakage from the mask is not measured. Objective: To describe a system that allows measurement of mask leakage and estimation of tidal volume delivery. Methods: Respiratory function monitors, a modified resuscitation mannequin, and a computer were used to measure leakage from the mask and to assess tidal volume delivery in a model of neonatal resuscitation. Results: The volume of gas passing through a flow sensor was measured at the face mask. This was a good estimate of the tidal volume entering and leaving the lung in this model. Gas leakage between the mask and mannequin was also measured. This occurred principally during inflation, although gas leakage during deflation was seen when the total leakage was large. A volume of gas that distended the mask but did not enter the lung was also measured. Conclusion: This system can be used to assess the effectiveness of positive pressure ventilation given using a face mask during simulated neonatal resuscitation. It could be useful for teaching neonatal resuscitation and assessing ventilation through a face mask. PMID:15871990

  9. Cloning of MASK, a novel member of the mammalian germinal center kinase III subfamily, with apoptosis-inducing properties

    DEFF Research Database (Denmark)

    Dan, Ippeita; Ong, Shao-En; Watanabe, Norinobu M;

    2002-01-01

    We have cloned a novel human GCK family kinase that has been designated as MASK (Mst3 and SOK1-related kinase). MASK is widely expressed and encodes a protein of 416 amino acid residues, with an N-terminal kinase domain and a unique C-terminal region. Like other GCK-III subfamily kinases, MASK do...... apoptosis upon overexpression in mammalian cells that is abrogated by CrmA, suggesting involvement of MASK in the apoptotic machinery in mammalian cells. Udgivelsesdato: 2002-Feb-22...

  10. Evaluation of Setup Uncertainties for Single-Fraction SRS by Comparing the Two Different Mask-Creation Methods

    CERN Document Server

    Baek, Jong Geun; Oh, Young Kee; Lee, Hyun Jeong; Kim, Eng Chan

    2015-01-01

    The purpose of this study was to evaluate the setup uncertainties for single-fraction stereotactic radiosurgery (SF-SRS) based on the clinical data with the two different mask-creation methods using pretreatment CBCT imaging guidance. Dedicated frameless fixation BrainLAB masks for 23 patients were created as a routine mask (R-mask) making method, as explained in the BrainLAB user manual. The alternative masks (A-mask) which were created by modifying the cover range of the R-mask for the patient head were used for 23 patients. The systematic errors including the each mask and stereotactic target localizer were analyzed and the errors were calculated as the mean and standard deviation (SD) from the LR, SI, AP, and yaw setup corrections. In addition, the frequency of three-dimensional (3D) vector length were also analyzed. The values of the mean setup corrections for the R-mask in all directions were small; < 0.7 mm and < 0.1 degree, whereas the magnitudes of the SDs were relatively large compared to the ...

  11. Automatic processing of facial affects in patients with borderline personality disorder: associations with symptomatology and comorbid disorders

    OpenAIRE

    Donges, Uta-Susan; Dukalski, Bibiana; Kersting, Anette; Suslow, Thomas

    2015-01-01

    Background Instability of affects and interpersonal relations are important features of borderline personality disorder (BPD). Interpersonal problems of individuals suffering from BPD might develop based on abnormalities in the processing of facial affects and high sensitivity to negative affective expressions. The aims of the present study were to examine automatic evaluative shifts and latencies as a function of masked facial affects in patients with BPD compared to healthy individuals. As ...

  12. Cuckoo search based optimal mask generation for noise suppression and enhancement of speech signal

    Directory of Open Access Journals (Sweden)

    Anil Garg

    2015-07-01

    Full Text Available In this paper, an effective noise suppression technique for enhancement of speech signals using optimized mask is proposed. Initially, the noisy speech signal is broken down into various time–frequency (TF units and the features are extracted by finding out the Amplitude Magnitude Spectrogram (AMS. The signals are then classified based on quality ratio into different classes to generate the initial set of solutions. Subsequently, the optimal mask for each class is generated based on Cuckoo search algorithm. Subsequently, in the waveform synthesis stage, filtered waveforms are windowed and then multiplied by the optimal mask value and summed up to get the enhanced target signal. The experimentation of the proposed technique was carried out using various datasets and the performance is compared with the previous techniques using SNR. The results obtained proved the effectiveness of the proposed technique and its ability to suppress noise and enhance the speech signal.

  13. Optimum wavelet based masking for the contrast enhancement of medical images using enhanced cuckoo search algorithm.

    Science.gov (United States)

    Daniel, Ebenezer; Anitha, J

    2016-04-01

    Unsharp masking techniques are a prominent approach in contrast enhancement. Generalized masking formulation has static scale value selection, which limits the gain of contrast. In this paper, we propose an Optimum Wavelet Based Masking (OWBM) using Enhanced Cuckoo Search Algorithm (ECSA) for the contrast improvement of medical images. The ECSA can automatically adjust the ratio of nest rebuilding, using genetic operators such as adaptive crossover and mutation. First, the proposed contrast enhancement approach is validated quantitatively using Brain Web and MIAS database images. Later, the conventional nest rebuilding of cuckoo search optimization is modified using Adaptive Rebuilding of Worst Nests (ARWN). Experimental results are analyzed using various performance matrices, and our OWBM shows improved results as compared with other reported literature. PMID:26945462

  14. Comparison of OPC job prioritization schemes to generate data for mask manufacturing

    Science.gov (United States)

    Lewis, Travis; Veeraraghavan, Vijay; Jantzen, Kenneth; Kim, Stephen; Park, Minyoung; Russell, Gordon; Simmons, Mark

    2015-03-01

    Delivering mask ready OPC corrected data to the mask shop on-time is critical for a foundry to meet the cycle time commitment for a new product. With current OPC compute resource sharing technology, different job scheduling algorithms are possible, such as, priority based resource allocation and fair share resource allocation. In order to maximize computer cluster efficiency, minimize the cost of the data processing and deliver data on schedule, the trade-offs of each scheduling algorithm need to be understood. Using actual production jobs, each of the scheduling algorithms will be tested in a production tape-out environment. Each scheduling algorithm will be judged on its ability to deliver data on schedule and the trade-offs associated with each method will be analyzed. It is now possible to introduce advance scheduling algorithms to the OPC data processing environment to meet the goals of on-time delivery of mask ready OPC data while maximizing efficiency and reducing cost.

  15. Small-Signal Analysis of Performance Characterization of Chaotic Masking Decoding in Injected Semiconductor Lasers

    Institute of Scientific and Technical Information of China (English)

    YAN Sen-Lin

    2005-01-01

    @@ Performance characterization of chaotic masking encoding and decoding is studied in synchronization injected semiconductor lasers under condition of injected-feedback. The modulation response function of chaotic masking encoding and its response factor are theoretically deduced and analysed by small-signal analysis. It is numerically demonstrated that there are peak values between 1.52 GHz and 3.18 GHz when the injection coefficient is between0.2 and 0.8. The chaotic synchronization error equation is theoretically deduced and its root is given by smallsignal analysis under condition of chaotic masking encoding. The chaotic decoding formula is also theoretically demonstrated. There are the least dale values of synchronization errors between the modulation frequencies of 0.79GHz and 1.91 GHz when the injection coefficient is between 0.1 and 0.8 in numerical simulation. The numerical result is well consistent with the theoretical demonstration.

  16. A Coronagraph with a Band-Limited Mask for Finding Terrestrial Planets

    CERN Document Server

    Kuchner, M J; Kuchner, Marc J.; Traub, Wesley A.

    2002-01-01

    Several recent designs for planet-finding telescopes use coronagraphs operating at visible wavelengths to suppress starlight along the telescope's optical axis while transmitting any off-axis light from circumstellar material. We describe a class of graded coronagraphic image masks that can, in principle, provide perfect elimination of on-axis light, while simultaneously maximizing the Lyot stop throughput and angular resolution. These ``band-limited'' masks operate on the intensity of light in the image plane, not the phase. They can work with almost any entrance pupil shape, provided that the entrance pupil transmissivity is uniform, and can be combined with an apodized Lyot stop to reduce the sensitivity of the coronagraph to imperfections in the image mask. We discuss some practical limitations on the dynamic range of coronagraphs in the context of a space-based terrestrial planet finder (TPF) telescope, and emphasize that fundamentally, the optical problem of imaging planets around nearby stars is a matt...

  17. Terahertz Coded Aperture Mask using a Vanadium Dioxide Bowtie Antenna Array

    CERN Document Server

    Nadri, Souheil; Kittiwatanakul, Lin; Arsenovic, Alex; Lu, Jiwei; Wolf, Stu; Weikle, Robert M

    2015-01-01

    Terahertz imaging systems have received substantial attention from the scientific community for their use in astronomy, spectroscopy, plasma diagnostics and security. One approach to designing such systems is to use focal plane arrays. Although the principle of these systems is straightforward, realizing practical architectures has proven deceptively difficult. A different approach to imaging consists of spatially encoding the incoming flux of electromagnetic energy prior to detection using a reconfigurable mask. This technique is referred to as coded aperture or Hadamard imaging. This paper details the design, fabrication and testing of a prototype coded aperture mask operating at WR 1.5 (500 to 750 GHz) that uses the switching properties of vanadium dioxide (VO2). The reconfigurable mask consists of bowtie antennas with vanadium dioxide VO2 elements at the feed points. From the symmetry, a unit cell of the array can be represented by an equivalent waveguide whose dimensions limit the maximum operating frequ...

  18. Assessing breast cancer masking risk with automated texture analysis in full field digital mammography

    DEFF Research Database (Denmark)

    Kallenberg, Michiel Gijsbertus J; Lilholm, Martin; Diao, Pengfei;

    2015-01-01

    PURPOSE The goal of this work is to develop a method to assess the risk of breast cancer masking, based on image characteristics beyond breast density. METHOD AND MATERIALS From the Dutch breast cancer screening program we collected 285 screen detected cancers, and 109 cancers that were screen...... (Quartile 1/2) versus high (Quartile 3/4) texture risk score. We computed odds ratios (OR) for breast cancer masking risk (i.e. interval versus screen detected cancer) for each of the subgroups. The OR was 1.63 (1.04-2.53 95%CI) for the high dense group (as compared to the low dense group), whereas...... that a breast cancer is masked in regular mammography, independently of breast density. As such it offers opportunities to further enhance personalized breast cancer screening, beyond breast density....

  19. Recovering hidden signals of statistical anisotropy from a masked or partial CMB sky

    CERN Document Server

    Aluri, Pavan K; Rotti, Aditya; Souradeep, Tarun

    2015-01-01

    Any isotropy violating phenomena on cosmic microwave background (CMB) induces off-diagonal correlations in the two-point function. These correlations themselves can be used to estimate the underlying anisotropic signals. Masking due to residual foregrounds, or availability of partial sky due to survey limitation, are unavoidable circumstances in CMB studies. But, masking induces additional correlations, and thus complicates the recovery of such signals. In this work, we discuss a procedure based on bipolar spherical harmonic (BipoSH) formalism to comprehensively addresses any spurious correlations induced by masking and successfully recover hidden signals of anisotropy in observed CMB maps. This method is generic, and can be applied to recover a variety of isotropy violating phenomena. Here, we illustrate the procedure by recovering the subtle Doppler boost signal from simulated boosted CMB skies, which has become possible with the unprecedented full-sky sensitivity of PLANCK probe.

  20. Properties and Microstructure of One-Step Cold Rolled Steel Strip for Shadow Mask

    Institute of Scientific and Technical Information of China (English)

    LIANG Xuan; LI Jun; PENG Ying-hong

    2008-01-01

    The effect of recrystallization annealing temperature on the properties and microstructure of one-step cold rolled steel strip for shadow mask was studied.The results showed that there was no yield point elongation when the tensile tests were performed on the samples for annealing temperatures ranging from 750℃ to 810 ℃.Moreover,increasing annealing temperature resulted in large grains,which was beneficial to the formability and magnetic property of steel strips.On the other hand,when the sample was annealed at 840 ℃,its microstructure showed ununifortuity with 0.04% yield point elongation,which was not good for the function of the shadow mask.Therefore,the proper recrystallization annealing temperature was about 810 ℃ for the present steel strip for shadow mask.