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Morphology and luminescence properties of ZnO layers produced by magnetron spattering  

International Nuclear Information System (INIS)

We show that the morphology and the luminescence properties of ZnO layers produced by magnetron sputtering can be controlled by technological parameters of sputtering, particularly by the ratio of argon to oxygen gases in the gas flow during the growth process. Smooth and flat layers were produced with a high Ar/O ratio, while porous layers with various morphologies were obtained with a low Ar/O ratio. The layers produced with O/Ar ration equal to 10 exhibit extremely high near-bandgap luminescence intensity even higher in comparison with bulk ZnO single crystals. The free carrier density estimated from the analysis of photoluminescence spectra is also very high in these samples suggesting that these technological conditions promote both optical and electrical activation of the doping Al impurity. The samples grown with high Ar/O ratios exhibit strong visible emission which is controlled by the technological conditions.

2011-07-07

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Amplified spontaneous emission from ZnO in n-ZnO/ZnO nanodots-SiO_2 composite/p-AlGaN heterojunction light-emitting diodes  

International Nuclear Information System (INIS)

This study demonstrates amplified spontaneous emission (ASE) of the ultraviolet (UV) electroluminescence (EL) from ZnO at #lambda##approx#380 nm in the n-ZnO/ZnO nanodots-SiO_2 composite/p- Al_0_._1_2Ga_0_._8_8N heterojunction light-emitting diode. A SiO_2 layer embedded with ZnO nanodots was prepared on the p-type Al_0_._1_2Ga_0_._8_8N using spin-on coating of SiO_2 nanoparticles followed by atomic layer deposition (ALD) of ZnO. An n-type Al-doped ZnO layer was deposited upon the ZnO nanodots-SiO_2 composite layer also by the ALD technique. High-resolution transmission electron microscopy (HRTEM) reveals that the ZnO nanodots embedded in the SiO_2 matrix have diameters of 3-8 nm and the wurtzite crystal structure, which allows the transport of carriers through the thick ZnO nanodots-SiO_2 composite layer. The high quality of the n-ZnO layer was manifested by the well crystallized lattice image in the HRTEM picture and the low-threshold optically pumped stimulated emission. The low ...

2009-04-22

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Thermal-catalytic cracking, a new process for complete decomposition of organic pollutants. Report on application 06/56/96 (feasibility study); Thermisch-katalytische Spaltung als neuartiges Verfahren zum vollstaendigen Abbau organischer Schadstoffe. Bericht zum Angebot Nr. 06/56/96 (Machbarkeitsstudie)  

Energy Technology Data Exchange (ETDEWEB)

This feasibility study of the uve Institut fuer Technische Chemie und Umweltschutz GmbH discusses the scientific and technical fundamentals of a catalytic process for complete removal of organic pollutants (PAH, H-HC, PCB, phenols, nitro-aromatics and organometallic compounds, e.g. from polluted soil and groundwater) by thermal-catalytic cracking and conversion into simple gases. The process is based on the catalytic reaction of the hydrocarbon compounds with water vapour in the temperature range of 700-900 degrees centigrade. The resulting gas mixtures consist mainly of hydrogen, carbon monoxide, carbon dioxide and methane which can be used as fuels, e.g. for heating or in gas engines. The process is an alterntive to combustion. It is therefore well suited whenever the pollutant to be removed is already mixed with water or water vapour and wherever in-situ removal would be too great a hazard. [Deutsch] Die vorliegende Machbarkeitsstudie aus dem uve Institut fuer Technische Chemie und ...

1998-05-01