Radiostrontium clearance and bone formation in response to simulated internal screw fixation
Energy Technology Data Exchange (ETDEWEB)
Changes in radiostrontium clearance (SrC) and bone formation (tetracycline labeling) were observed in the femurs of skeletally mature dogs following the various operative steps involved in bone screw fixation. Drilling, but not periosteal stripping, produced a small but statistically significant increase in SrC and endosteal bone formation in the distal third of the bone. Strontium clearance values equivalent to those produced by drilling alone were recorded after screw fixation at low or high torque (5 versus 20 inch pounds), as well as by the insertion of loosely fitting stainless steel implants. Bone formation (equals the percentage tetracycline-labeled trabecular bone surfaces) was increased by 30% when SrC values exceeded 3.5 ml/100 g bone/min, and the relationship was linear when SrC values ranged between 1.0 and 7.0 ml/100 g bone/min. The changes in SrC and bone formation one-week after bone ...
1987-06-01
British Library Electronic Table of Contents (United Kingdom)
ABSTRACT Purpose: The aim of this two-center study was to evaluate screw-type titanium implants with a chemically modified, sandblasted and acid-etched surface when placed in the posterior maxilla or mandible, and loaded 21 days after placement. Material and Methods: All 56 patients met strict inclusion criteria and provided informed consent. Each patient displayed either a single-tooth gap, an extended edentulous space, or a distal extension situation in the posterior mandible or maxilla. Eighty-nine dental implants (SLActive, Institut Straumann AG, Basel, Switzerland) were inserted according to an established nonsubmerged protocol and underwent undisturbed healing for a period of 21 days. Where appropriate, the implants were loaded after 21 days of healing with provisional restorations i...
2010-01-01
A patient with a totally edentulous maxilla and a seVere Class III intermaxillary relationship in the anterior region was treated by implants. In the mandible, there were 10 teeth between the second premolars. The inclination and width of the maxillary anterior residual bone were measured on cephalometric X-ray film obtained before treatment. The results of cephalometric analysis did not support clockwise rotation of the mandible or lingual angling of the maxillary anterior teeth by use of prosthesis to improve the Class III relationship. Ten implants were simultaneously placed in the maxilla. Then, a maxillary temporary full bridge was seated after reduction of the crown lengths of the mandibular anterior teeth. An apically positioned flap operation was performed to eliminate periodontal pockets and to obtain clinically suitable crown lengths of the mandibular anterior teeth. A noncemented, screw-retained maxillary full ...
2004-01-01
UK PubMed Central (United Kingdom)
Effective connectivity in brain networks can be studied using Granger causality analysis which is based on temporal precedence, while functional connectivity is usually derived using zero-lag...Full Text Available
2010-06-01
Energy Technology Data Exchange (ETDEWEB)
Early recognition of recurrence and work-up of clinically indeterminate lesions may be impaired after reconstruction with silicone implants due to superimposition of the implant or to scarring. This study was undertaken to evaluate the use of contrast-enhanced MRI in patients with silicone implant after breast cancer. Contrast-enhanded MRI was offered to 169 patients. Comparative two- to three-view mammography was also performed in 169 patients, as well as comparative sonography in 144 patients. Conventional imaging and clinical examination detected only 8/13 recurrences, whereas 12/13 were detected by MRI. One recurrence had been visible as a strongly enhancing 2-mm dot in a previous examination (2 years before), but was not called. It was therefore counted as false negative. In addition, multicentricity was detected by MRI alone in two of three cases. MRI correctly diagnosed scar tissue in all cases with indeterminate ...
1997-09-01
Energy Technology Data Exchange (ETDEWEB)
Beside sucker-rod-type pumps and submersible centrifugal pumps, excentric screw pumps (so-called progressing cavity pumps) belong to standard conveyors in the production of crude oil. The authors of the contribution under consideration present the further development of excentric screw pumps with respect to the reduction of fluid levels in gas wells. This further development is based on a co-operation between the operator (Rohoel Aufsuchungs AG (Gampern, Austria)), the pump supplier (NETZSCH Oilfield Products GmbH (Selb, Federal Republic of Germany)) and the Institute for Process Technologies and Machinery at the University of Erlangen-Nuernberg (Federal Republic of Germany). The authors report on first attempts with the excentric screw pump at Weizberg (Federal Republic of Germany), material investigations at the University of Erlangen-Nuernberg, optimization of pump components and pump systems as well as on the ...
2008-10-23
British Library Electronic Table of Contents (United Kingdom)
An organically modified montmorillonite (MMT) was compounded with polybutylene terephthalate (PBT) in a twin-screw extruder. The organoclay PBT nanocomposites were then injection molded by conventional and microcellular methods. Nitrogen was used as the blowing agent. The effect of organoclay content, organoclay size (8 and 35mm), and speed of the screw (80 and 100rpm) on the mechanical and thermal properties were investigated. The results showed that when the MMT content was 1.0wt.%, the nanocomposites have maximum tensile strength, wear resistance, and cell density. Moreover, the larger the particle size, the greater the tensile strength. The screw speed during compounding also affected the mechanical strength. The higher speed of the screw increased the tensile strength of the nanocompo...
2010-01-01
Energy Technology Data Exchange (ETDEWEB)
This study shows that the physical conditions necessary for thermal waves to materialize in Dual-Phase-Lagging porous media conduction are not attainable in a porous slab subject to a combination of constant heat flux and temperature (Neumann and Dirichlet) boundary conditions. It is demonstrated that the approximate equivalence between Dual-Phase-Lagging (DuPhlag) heat conduction model and the Fourier heat conduction in porous media subject to Lack of Local Thermal Equilibrium (La Lotheq) that suggested the possibility of thermal oscillations and resonance reveals a condition that cannot be fulfilled because of physical constraints. (author)
2005-07-01
International Science & Technology Center (ISTC)
Development of Oxygen Ion-Implanted Collector materials for Thermal Emission Converters of Thermal Energy into the Electric One.
Control of Phosphorus Transient Enhanced Diffusion using Co-implantation
Control of Phosphorus Transient Enhanced Diffusion using Co-implantation
2006-01-01
Ignition timing control apparatus with knock sensor
Energy Technology Data Exchange (ETDEWEB)
In an ignition timing control apparatus for controlling the ignition timing of each cylinder in order to reduce knock generation in a multi-cylinder engine, a lag-angle correction is made for the ignition timing of a cylinder in which a knock is generated and at the same time, a slight lag-angle correction is made for the ignition timing of the other cylinders in which no knock is generated. When the operating condition of engine is rapidly changed for example, under the condition in which knock is liable to occur in all cylinders as at rapid acceleration time, a lag-angle correction is made by the same amount as in the knock generating cylinder, for the ignition timing of cylinders in which no knock is generated. When no knock is generated for a predetermined time, a lead-angle correction is made for the ignition timing subjected to the lag-angle correction of each cylinder at intervals of the ...
1984-05-01
UK PubMed Central (United Kingdom)
We performed biomechanical comparison of a xenograft bone plate-screw (XBPS) system for achieving cadaveric lumbar transpedicular stabilization (TS) in dogs. Twenty dogs' cadaveric L2-4 lumbar...Full Text Available
2008-06-01
A facet concentrator of solar energy
Energy Technology Data Exchange (ETDEWEB)
A concentrator which contains mirrors installed on a carrier frame by means of hinges is described. In order to improve the performance of a concentrator it contains a mechanism for controlling radiation density in a form of a screw attached to the carrier frame. It also contains a circular sliding coupling on the frame which has an annular groove with levers placed in it. The mirrors are connected to the sleeve by means of the levers, and the hinges are made cylindrical and have axes that are perpendicular to the axes of the screw.
1981-02-28
Energy Technology Data Exchange (ETDEWEB)
Experimental investigation of heat transfer and friction factor characteristics of circular tube fitted with full-length helical screw element of different twist ratio, and helical screw inserts with spacer length 100, 200, 300 and 400mm have been studied with uniform heat flux under laminar flow condition. The experimental data obtained are verified with those obtained from plain tube published data. The effect of spacer length on heat transfer augmentation and friction factor, and the effect of twist ratio on heat transfer augmentation and friction factor have been presented separately. The decrease in Nusselt number for the helical twist with spacer length is within 10% for each subsequent 100mm increase in spacer length. The decrease in friction factor is nearly two times lower than the full length helical twist at low Reynolds number, and four times lower than the full length helical twist at high Reynolds number for all twist ratio. The ...
2007-02-15
Evaluation on the cooling capacity of the SMART-P CEDM cooler using CFD code
Energy Technology Data Exchange (ETDEWEB)
Ball screw bearings are used for the fine control of Control Rod Drive Mechanism (CEDM) for the SMART-P. Because the friction coefficient of the ball screw bearings suddenly increases at the limit temperature of 120 .deg. C, the surrounding temperature of the ball screw bearings should be less than the limit temperature for the functional integrity of the CEDM. The CEDM coolers are installed at the lower portion of the ball screw bearings to maintain the bearings' temperature less than the limit. In order to check the CEDM cooler satisfy the temperature limit of ball screw bearing at the possible operational conditions, the cooling capacity of the CEDM coolers, which was determined at the stage of 'conceptual design', is evaluated using the Computational Fluid Dynamics(CFD) code, Fluent. The analysis result shows that the current CEDM coolers satisfy the ...
2004-07-01
Evaluation on the cooling capacity of the SMART-P CEDM cooler using CFD code
International Nuclear Information System (INIS)
Ball screw bearings are used for the fine control of Control Rod Drive Mechanism (CEDM) for the SMART-P. Because the friction coefficient of the ball screw bearings suddenly increases at the limit temperature of 120 .deg. C, the surrounding temperature of the ball screw bearings should be less than the limit temperature for the functional integrity of the CEDM. The CEDM coolers are installed at the lower portion of the ball screw bearings to maintain the bearings' temperature less than the limit. In order to check the CEDM cooler satisfy the temperature limit of ball screw bearing at the possible operational conditions, the cooling capacity of the CEDM coolers, which was determined at the stage of 'conceptual design', is evaluated using the Computational Fluid Dynamics(CFD) code, Fluent. The analysis result shows that the current CEDM coolers satisfy the CEDM temperature limit of ...
2004-05-27
Exchange rate pass-through: A generalization
British Library Electronic Table of Contents (United Kingdom)
The extent of exchange rate pass-through has been playing an increasingly pivotal role in the transmission of exchange rate shocks and adequate policy responses. We develop a model of exchange rate pass-through that allows the stochastic process of exchange rate to include the lagged values of the velocity of money. We show that the likelihood and extent of pass-through is sensitive to the lagged response.
2010-01-01
British Library Electronic Table of Contents (United Kingdom)
Aim.- To describe the clinical aspects of implantable cardioverter defibrillators care in Sweden with focus on organisation, the role and education of nurses, patient information and education and areas in need of improvement. Background.- Implantable cardioverter defibrillators implantations have developed rapidly in recent years and are now an established arrhythmia treatment. The expanding indication for implantable cardioverter defibrillators implantation demands new competencies and resources in the implantable cardioverter defibrillators team members. Methods.- Participants were recruited among physicians and nurses in all of the hospitals implanting implantable cardioverter defibrillators (n-=-16). Data were collected by a questionnaire. Additionally, all written educational materia...
2011-01-01
Studies on ball screw type damper with flyball governor, 1st report
International Nuclear Information System (INIS)
The forced nonlinear vibration and its stability of a single-degree-of-freedom system with a ball screw type damper which is composed of a ball screw, a flywheel and a flyball governor are discussed theoretically. The results are compared with a linear solution and the experimental results. The effect of vibration isolation of the damper is also discussed. Numerical examples are given for several ratios of the natural frequencies in the primary system to the governor. It is demonstrated that, when the natural frequency ratio is chosen suitably, the damper is effective in suppressing the resonance of the primary system. The amplitude response curve of the primary system is approximately equal to the linear solution except in the vicinities of the natural frequencies of the primary system and the governor, and is stable except in the vicinity of the natural frequency of the governor. (author).
1986-01-01
Studies on ball screw type damper with centrifugal brakes
International Nuclear Information System (INIS)
The effects of vibration isolation of the new type of mechanical damper applied to a single-degree-of-freedom system and a simple beam are discussed numerically and experimentally. The damper is composed of a ball screw, a flywheel and centrifugal brakes, and possesses nonlinear characteristics. The Continuous System Simulation Language is used for the digital simulations of the nonlinear vibration systems. The results may be summarized as follows: (1) The damper is effective for suppressing the amplitude of the single-degree-of-freedom system as well as of the beam at the point of attachment of the damper, at the resonances. (2) The damper approaches a snubber for smaller values of lead L of the ball screw (or larger values of moment of inertia J of the flywheel), and acts like a damper whose damping force is proportional to the square of the velocity for larger values of L (or smaller values of J). (author).
1986-01-01
Augmentation of laminar flow and heat transfer in flat tubes by means of helical screw-tape inserts
British Library Electronic Table of Contents (United Kingdom)
The heat transfer a characteristics and friction factor in the horizontal double pipes of flat tubes with full length helical screw element of different twist ratio and helical screw inserts with different spacer length are investigated. Cold and hot water are used as working fluid in tube side and shell side respectively. The experiments covered a range of Reynolds numbers 5.7x102Re1.31x103. The effect of spacer length on the heat transfer augmentation and friction factor and the effect of twist ratio on heat transfer augmentation and friction factor have been presented separately. The study shows that, the Nusslet number (Nu) and friction factor (f) decrease with the increase of S or Y for flat tube. The comparison between the data of present plain circular with that of previous plain ci...
2011-01-01
UK PubMed Central (United Kingdom)
PurposeIn situ fixation for mild to moderate slipped capital femoral epiphysis (SCFE) remains an acceptable treatment methodology in most centers. Satisfactory fixation results have...Full Text Available
2010-06-01
British Library Electronic Table of Contents (United Kingdom)
Today, the use of the arch bars in the treatment of mandibular fractures is common [1]. But it has complications such as damaged teeth, periodontal tissue [2], risk of blood transmitted disease [3] and premature contact with maxillary incisor teeth in anterior deep bite occlusion. Many techniques are used for resolving these problems. In this paper, we describe the technique of using Maxillo-Mandibular Fixation Screws (MMFS) with essig wiring of anterior mandibular teeth in the management of symphyseal fracture of deep bite patients.
2009-01-01
A wrench for screwing and unscrewing lock connections
Energy Technology Data Exchange (ETDEWEB)
A wrench is proposed for screwing and unscrewing lock connections, which includes a spring loaded base, a faceplate with low moment and high moment mechanisms and subassemblies for moving them. In order to increase the operational reliability, the wrench is equipped with uprights evenly disposed along the perimeter of the base with hinged suspensions for linking the base, the hinged suspension is made in the form of interconnected links for the upper and lower traverses with the hinges. One of the hinges is positioned between the upper traverse and the upright, while the other is located between the lower traverse and the base.
1983-01-01
International Nuclear Information System (INIS)
Hoogenstraaten's heating rate method has generally been considered as a reliable method for determining thermoluminescence trapping parameters of first order glow peaks. However, experience has shown that in some cases the deviation between the heating rate method and glow curve fitting method can be quite significant (considering only the linear part of the heating rate plot, of course). In this study it is shown that one of the main reasons for this deviation can be a systematic increase of a temperature lag between the measured and real temperature of the sample with increasing heating rate. It appears that this systematic increase of the temperature lag affects the method in the range of low heating rates (linear part of the heating rates plots) more than has been previously realised. The effect of the temperature lag on Hoogenstraaten's heating rate method is a decrease in activation energy and frequency factor and is ...
1998-07-05
Energy Technology Data Exchange (ETDEWEB)
Hoogenstraaten's heating rate method has generally been considered as a reliable method for determining thermoluminescence trapping parameters of first order glow peaks. However, experience has shown that in some cases the deviation between the heating rate method and glow curve fitting method can be quite significant (considering only the linear part of the heating rate plot, of course). In this study it is shown that one of the main reasons for this deviation can be a systematic increase of a temperature lag between the measured and real temperature of the sample with increasing heating rate. It appears that this systematic increase of the temperature lag affects the method in the range of low heating rates (linear part of the heating rates plots) more than has been previously realised. The effect of the temperature lag on Hoogenstraaten's heating rate method is a decrease in activation energy and ...
1999-07-01
UK PubMed Central (United Kingdom)
Objective:This the first of two articles reviewing the scientific literature on the evaluation and treatment of circadian rhythm sleep disorders (CRSDs), employing the methodology...Full Text Available
2007-11-01
Osseointegration of zirconia implants: an SEM observation of the bone-implant interface
UK PubMed Central (United Kingdom)
BackgroundThe successful use of zirconia ceramics in orthopedic surgery led to a demand for dental zirconium-based implant systems. Because of its excellent biomechanical characteristics,...Full Text Available
Optical and Structural Characteristics of Heavily Boron-Implanted CdTe.
Cadmium telluride single crystals were subjected to multiple-energy boron ion implants with total doses up to 1.5 x 10 sq cm. Various diagnostic techniques were used to assess the structural and electronic properties of these crystals in their as-implante...
1988-01-01
Music perception in cochlear implant users and its relationship with psychophysical capabilities
UK PubMed Central (United Kingdom)
This article describes issues concerning music perception with cochlear implants, discusses why music perception is usually poor in cochlear implant users, reviews relevant data, and describes...Full Text Available
2008-01-01
Complications of NewColorIris implantation in phakic eyes: a review
UK PubMed Central (United Kingdom)
Purpose:To provide a literature review of implant related complications from bilateral NewColorIris implantation (Kahn Medical Devices, Panama City, Panama).Methods:A...Full Text Available
2011-01-01
Energy Technology Data Exchange (ETDEWEB)
Objective: To evaluate the treatment of malignant biliary stenoses and occlusions using a new stent. Methods: In a prospective study, 25 patients with malignant obstructive jaundice were treated with SMART stents. The handling and the quality of stent expansion were documented. Stent function was assessed 2-4 days after intervention by cholangiography and laboratory tests. A follow-up was performed three months, after stent placement. Results: All lesions were treated successfully, with a total of 35 stents implanted. In 14 patients a further balloon dilatation was performed after stent placement (8-10 mm diameter/40-80 mm length). The mean serum bilirubin level decreased significantly from 11.6 mg/dl to 4.6 mg/dl after intervention (p<0.05). The follow-up showed a mean serum bilirubin level at 4.0 mg/dl. In 4 cases (16%) a further intervention (PTCD or stent) was performed. Six patients died due to tumor progression. The stents proved to be patent in 79% ...
2002-10-01
Osseointegration of zirconia implants compared with titanium: an in vivo study
UK PubMed Central (United Kingdom)
BackgroundTitanium and titanium alloys are widely used for fabrication of dental implants. Since the material composition and the surface topography of a biomaterial play a fundamental...Full Text Available
Neural Tissues from the Implanted Stem Cells
International Science & Technology Center (ISTC)
Morphological, Electrophysiological and Behavioral Investigations of the Nervous Tissue Developed from the Embryonic Matrix Zone Cells of the Dorsolateral Walls of Lateral Ventricles, Implanted into the Lesioned Regions of the Adult Rat's Brain
Behavior of osteoblastic cells cultured on titanium and structured zirconia surfaces
UK PubMed Central (United Kingdom)
BackgroundOsseointegration is crucial for the long-term success of dental implants and depends on the tissue reaction at the tissue-implant interface. Mechanical properties and biocompatibility...Full Text Available
Aphakic macular oedema following prosthetic lens implantation.
UK PubMed Central (United Kingdom)
Fluorescein angiography of the iris was performed on patients with plastic lens implants with cystoid oedema of the macula, and the nature of the vascular changes was compared with controls provided...Full Text Available
1977-05-01
Augmentation of laminar flow and heat transfer in flat tubes by means of helical screw-tape inserts
Energy Technology Data Exchange (ETDEWEB)
The heat transfer a characteristics and friction factor in the horizontal double pipes of flat tubes with full length helical screw element of different twist ratio and helical screw inserts with different spacer length are investigated. Cold and hot water are used as working fluid in tube side and shell side respectively. The experiments covered a range of Reynolds numbers 5.7 x 10{sup 2} {<=} Re {<=} 1.31 x 10{sup 3}. The effect of spacer length on the heat transfer augmentation and friction factor and the effect of twist ratio on heat transfer augmentation and friction factor have been presented separately. The study shows that, the Nusslet number (Nu) and friction factor (f) decrease with the increase of S or Y for flat tube. The comparison between the data of present plain circular with that of previous plain circular tube showed a good agreement between them but the data of present plain flat tube showed a higher in heat ...
2011-01-15
British Library Electronic Table of Contents (United Kingdom)
It is necessary to remove chlorine efficiently from municipal waste plastics (MWP) that contain polyvinyl chloride (PVC) and other plastics containing chlorine. In this article we consider thermal degradation liquefaction technology. In Japan, the chlorine content of reclamation oil products must be kept below 100 ppm owing to the quality standard for pyrolysis oil. Liquefaction dechlorination technology for MWP is still an important issue to study. The twin-screw extruder that has been developed as dechlorination technology for blast furnaces and coke ovens has a shorter residence time for dechlorination than other dechlorination technologies. In this article, we used a single-screw extruder for the dechlorination process because it also has a short residence time. Experiments on the dech...
2010-01-01
Food and biomass production in small oil expression facilities
Energy Technology Data Exchange (ETDEWEB)
This paper reported on a study in which rapeseeds were separated into high quality seed for food oil and low quality seed for biofuels. A laboratory-scale oilseed screw press was then used to examine the effects of choke opening and seed preheating on the rapeseed pressing performance and the quality of food oil and biofuels oil. Oil recovery and chlorophyll content was found to increase as maximum pressure increased. In terms of pressing performance, the rapeseed heated by microwaves yielded more oil and chlorophyll than without heating. The NEB ratio of microwave heating press with an 8.0 mm choke opening was advantageous. Rapeseed oil extracted from low quality seeds was found to have a high acid value. The quality of oil extracted by oilseed screw press was found to be good and met the requirements of the Codex Alimentarius for edible oils.
2010-07-01
Energy Technology Data Exchange (ETDEWEB)
Investigations of dislocation structure and mechanical properties of iron after rolling deformation in shaped rolls and after hydroextrusion are conducted. It is shown that dislocation iron structure slightly changes with deformation degree after rolling in shaped rolls and annealing and it is characterized by low density of screw dislocations. Cold brittleness temperature decreases in the result of rolling and the succeeding recrystallization and impact strength increases both at room temperature and at low temperatures. Screw dislocations having high Peierls barrier prevail in the structure after hydroextrusions. The iron deformed by hydroextrusion at 400 mPa and higher after annealing has high cold brittleness temperature and low impact strength.
1982-03-01
Design and mass transfer characteristics of rotating screw brush horizontal distillation column
Energy Technology Data Exchange (ETDEWEB)
A distillation column with an adjustable slope horizontal rectification section was constructed. A rotating screw brush was inserted into the section, which could be rotated from 0 to 600 rpm with an external motor. Distillation experiments were carried out using the system cyclohexane-heptane at total reflux at slopes of 0(horizontal), 5 and 10 degrees. Separation efficiency for the horizontal column was the highest of the three orientations, and was obtained as HETP from 0.04 to 0.16 m at F-factor of 0.05 to 0.4 m/s(kg/m{sup 3}){sup 1/2} in the range of 100 to 600 rpm. The HETP for each slope was roughly constant at a rotation speed of more than 300 rpm. The values of the pressure drop were found to be equivalent to those of one seventh to one fifth of conventional packed columns. (author)
2000-10-01
Pitting corrosion resistance of silicon-implanted stainless steels
International Nuclear Information System (INIS)
The pitting corrosion resistance of three different types of stainless steel implanted with silicon is investigated using the potentiokinetic polarization technique. The specimens are tested in 3% NaCl and 0.1 N HCl solutions. Silicon ion implantation inhibits pitting corrosion of the steels in both aqueous media. The corrosion resistance depends on the silicon dose. Post implantation annealing only slightly alters the localized corrosion. (author).
Multi-functional Biocompatible Coatings
International Science & Technology Center (ISTC)
Multi-functional Bioactive Nano-structured Coatings for Load-Bearing Implants
Modeling of defect-phosphorus pair diffusion in phosphorus-implanted silicon
International Nuclear Information System (INIS)
The point-defect-impurity pair diffusion model proposed recently by Mulvaney and Richardson is adopted and modified to simulate the coupled diffusion of phosphorus and self-interstitials in phosphorus-implanted silicon. The assumption of implantation-induced, but empirically determined initial interstitial distributions of Gaussian shape allows a simulation of the net effect of transient enhanced diffusion. As a result an improved modeling of phosphorus diffusion in silicon is achieved for a broad range of ion-implantation and annealing conditions. (author).
British Library Electronic Table of Contents (United Kingdom)
Statement of problem Porcelain fracture associated with an implant-supported, metal ceramic crown or fixed partial denture occurs at a higher rate than in tooth-supported restorations, according to the literature. Implant-specific and patient-specific causes of ceramic failure have not been fully evaluated. Purpose The purpose of this retrospective study was to evaluate the potential statistical predictors for porcelain fracture of implant-supported, metal ceramic restorations. Material and Methods Over a 6-month period, a consecutive series of patients having previously received implant-supported, metal ceramic fixed restorations were examined during periodic recall appointments. The number of supporting implants, number of dental units, type of restoration, date of prosthesis insertion, ...
2009-01-01
Electrical properties of focused-ion-beam boron-implanted silicon
International Nuclear Information System (INIS)
Electrical properties of 16 keV, focused-ion-beam (FIB) (beam diameter: 1 #mu#m, current density: 50 mA/cm"2) boron-implanted silicon layers have been investigated as a function of beam scan speed and ion dose, and compared with those obtained by conventional implantation (current density: 0.4 #mu#A/cm"2). High electrical activation of the FIB implanted layers is obtained by annealing below 800"0C as a result of the increase in amorphous zones created in the implanted layers. Amorphous zone overlapping is assumed to occur at FIB implantation doses of 3 - 4 x 10"1"5 ions/cm"2 from the results of electrical activation and the carrier profile of implanted regions annealed at low temperature, if beam scan speed is lowered to about 10"-"2 cm/s. (author).
Energy Technology Data Exchange (ETDEWEB)
The effect of Al and Be ions pre-implantation on microstructural change and, the formation and growth of He bubbles in SiC/SiC composite was investigated. Four kinds of ion implanted specimens were prepared with 100 appm Al, 1000 appm Al, 100 appm Be and 1000 appm Be implanted. No microstructural change was observed in the matrices and fibers of SiC/SiC composites implanted with Al or Be ions up to 1000 appm. The un-implanted and Al or Be pre-implanted SiC/SiC composites were simultaneously irradiated to 10 dpa using triple ion-beams (6.0-MeV Si{sup 2+}, 1.0-MeV He{sup +} and 340-keV H{sup +}) at 1000 deg. C. Helium bubbles were formed in every matrix and fiber irradiated by triple ion-beams. The size of He bubbles in the matrix was increased by implanting Al or Be ions and increased with increasing amount of implanted ...
2007-03-15
International Nuclear Information System (INIS)
The effect of Al and Be ions pre-implantation on microstructural change and, the formation and growth of He bubbles in SiC/SiC composite was investigated. Four kinds of ion implanted specimens were prepared with 100 appm Al, 1000 appm Al, 100 appm Be and 1000 appm Be implanted. No microstructural change was observed in the matrices and fibers of SiC/SiC composites implanted with Al or Be ions up to 1000 appm. The un-implanted and Al or Be pre-implanted SiC/SiC composites were simultaneously irradiated to 10 dpa using triple ion-beams (6.0-MeV Si"2"+, 1.0-MeV He"+ and 340-keV H"+) at 1000 deg. C. Helium bubbles were formed in every matrix and fiber irradiated by triple ion-beams. The size of He bubbles in the matrix was increased by implanting Al or Be ions and increased with increasing amount of implanted Al or Be ions. ...
2007-03-01
High current implantation of negative copper ions into silica glasses
Energy Technology Data Exchange (ETDEWEB)
High-current implantation of Cu{sup {minus}} ions into silica glasses has been demonstrated using mA-class negative ion beams at 60 keV. Negative ion implantation has an advantage to alleviate specimen charging for insulating substrates and has attained high dose rates, up to 260 {micro}A/cm{sup 2}. Spherical Cu colloids form in the silica glasses without additional thermal annealing. Optical absorption and reflection of the implanted specimens vary with the current density, even at a fixed dose level. A beam-induced surface plasma may affect the high current implantation.
1997-12-01
Sloshing of fluid in horizontal steam generator generated by horizontal and vertical seismic motions
International Nuclear Information System (INIS)
The nuclear power plants with WWER type reactors are characterized by horizontally situated steam generators (SG). During seismic event the horizontal and vertical ground accelerations induce fluid motion in directions of longitudinal and transversal axis. Resulting dynamic forces act on the SG attachment and could cause the failure of screws. In obvious PSA scenarios, these phenomena are classified as a indirect induced LOCA. In this paper the effects of transversal sloshing of fluid are analyzed.
1989-08-14
...of Mixing Sections 9 Interacting Rotor/Stator Mixers 10 Floating Ring Mixing Devices 11 Static (or Motionless) Mixers 12 Incorporation of Liquid Additives and Dispersions by Direct Addition 13 Dispersive Mixing of Fillers and Pigments 14 Dispersive Mixing Applied to Polymer Blending 15 Compounding with Single Screw Extruders Appendix - Preparation of Microtome Sections for Assessment of Dispersive In order to get a feel for this book, you can view Chapter 1 now, simply follow the link ...
Coal demonstration plants. Quarterly report, October--December 1976
In addition to an executive summary and glossary, the following sections are included: Clean Boiler Fuel Demonstration Plant; Development of Coal Feeders for Coal Gasification Operations; Development of a Continuous Dry Coal Screw Feeder; Coal Feeder Development Program; Engineering and Technical Support; Technical Assistance Services; and Conceptual Design for an Advanced Coal Liquefaction Commercial Plant. (EJH)
1976-01-01
Coal demonstration plants. Quarterly report, July--September 1976
In addition to an executive summary and glossary, the following sections are included: Clean Boiler Fuel Demonstration Plant; Development of Coal Feeders for Coal Gasification Operations; Development of a Continuous Dry Coal Screw Feeder; Coal Feeder Development Program; Engineering and Technical Support; and Technical Assistance Services. (EJH)
1976-01-01
XPS study of passive films formed on molybdenum-implanted austenitic stainless steels
Energy Technology Data Exchange (ETDEWEB)
Austenitic stainless steels have been implanted with molybdenum ions (Mo[sup +], 100 keV, 2.5 x 10[sup 16] atoms cm[sup -2]). The implanted material has been characterized by XPS and RBS. The implanted region has a thickness of [approx] 1000 A with a maximum molybdenum concentration of [approx] 9 at.% Mo located at [approx] 210 A from the surface. The effects of implanted molybdenum on the passivation of the alloy in 0.5 M H[sub 2]SO[sub 4] have been investigated by electrochemistry and XPS. After XPS analysis the samples were transferred without exposure to air into a glove-box with an inert atmosphere. The electrochemical behaviour of the alloy is significantly modified by the implanted molybdenum. The major effect is that the activation peak disappears. A bilayer structure (outer hydroxide/inner oxide) of the passive film is observed for both the implanted ...
1992-06-01
XPS study of passive films formed on molybdenum-implanted austenitic stainless steels
International Nuclear Information System (INIS)
Austenitic stainless steels have been implanted with molybdenum ions (Mo"+, 100 keV, 2.5 x 10"1"6 atoms cm"-"2). The implanted material has been characterized by XPS and RBS. The implanted region has a thickness of #approx# 1000 A with a maximum molybdenum concentration of #approx# 9 at.% Mo located at #approx# 210 A from the surface. The effects of implanted molybdenum on the passivation of the alloy in 0.5 M H_2SO_4 have been investigated by electrochemistry and XPS. After XPS analysis the samples were transferred without exposure to air into a glove-box with an inert atmosphere. The electrochemical behaviour of the alloy is significantly modified by the implanted molybdenum. The major effect is that the activation peak disappears. A bilayer structure (outer hydroxide/inner oxide) of the passive film is observed for both the implanted and ...
1991-10-01
Corrosion behaviour of molybdenum-implanted stainless steel
Energy Technology Data Exchange (ETDEWEB)
A low-molybdenum austenitic stainless steel (UNS S30100) has been surface implanted with molybdenum ions, using various doses of 50 keV and 140 keV ions at room temperature. It is found that in aqueous sulphate/chloride solutions similar to the constitution of sea-waters the implantation does not affect the potentiostatically-determined critical pitting potential, but does change the density and morphology of corrosion pits. Pitting initiation after the addition of chloride at a fixed potential indicates little change in the time for measurable current increase, but the rate of increase of the current is much lower for implanted material. Detailed examination using optical microscopy, scanning electron microscopy, transmission electron microscopy and selected area diffraction suggests that the pits produced in implanted material are hemispherical with smooth covers of unattacked alloy. The use of ...
1990-01-01
Corrosion behaviour of molybdenum-implanted stainless steel
International Nuclear Information System (INIS)
A low-molybdenum austenitic stainless steel (UNS S30100) has been surface implanted with molybdenum ions, using various doses of 50 keV and 140 keV ions at room temperature. It is found that in aqueous sulphate/chloride solutions similar to the constitution of sea-waters the implantation does not affect the potentiostatically-determined critical pitting potential, but does change the density and morphology of corrosion pits. Pitting initiation after the addition of chloride at a fixed potential indicates little change in the time for measurable current increase, but the rate of increase of the current is much lower for implanted material. Detailed examination using optical microscopy, scanning electron microscopy, transmission electron microscopy and selected area diffraction suggests that the pits produced in implanted material are hemispherical with smooth covers of unattacked alloy. The use of ...
1989-09-01
Modelling the spatial and temporal evolution of winter glacier mass balance.
Environmental Research Database
DescriptionChanges in glacier mass balance are critically influenced by the distribution of snow accumulation at the start of the melt season, but models of the winter season lag seriously behind those of the melt season. The overall aim is to test physically-based models of the spatial and temporal evolution of the winter snowpack at a temperate ice cap (Langjokull, Iceland), to assess how effectively and also how efficiently they capture variation in winter accumulation. A three-step modelling approach i [continued...
2004-01-31
The characteristics of surface oxidation and corrosion resistance of nitrogen implanted zircaloy-4
International Nuclear Information System (INIS)
This work is concerned with the development and application of ion implantation techniques for improving the corrosion resistance of zircaloy-4. The corrosion resistance in nitrogen implanted zircaloy-4 under a 120 keV nitrogen ion beam at an ion dose of 3 x 10"1"7 cm"-"2 depends on the implantation temperature. The characteristics of surface oxidation and corrosion resistance were analyzed with the change of implantation temperature. It is shown that as implantation temperature rises from 100 to 724 C, the colour of specimen surface changes from its original colour to light yellow at 100 C, golden at 175 C, pink at 300 C, blue at 440 C and dark blue at 550 C. As the implantation temperature goes above 640 C, the colour of surface changes to light black, and the surface becomes a little rough. The corrosion resistance of zircaloy-4 implanted ...
Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator
Energy Technology Data Exchange (ETDEWEB)
The indium implant damage and diffusion behavior in thin silicon-on-insulator (SOI) with a 200 nm top silicon layer were studied for different implantation energies and doses. Rutherford backscattering spectrometry in the channeling mode (RBS/C) was used to characterize the implant damage before and after annealing. Secondary ion mass spectrometry (SIMS) was used to study the indium transient enhanced diffusion (TED) behavior in the top Si layer of the SOI structure. An anomalous redistribution of indium after relatively high energy (200 keV) and dose (1 x 10{sup 14} cm{sup -2}) implantation was observed in both bulk Si and SOI substrates. However, there exist differences in these two substrates that are attributable to the more predominant out-diffusion of indium as well as the influence of the buried oxide layer in the SOI structure.
2004-12-15
Implant damage and redistribution of indium in indium-implanted thin silicon-on-insulator
International Nuclear Information System (INIS)
The indium implant damage and diffusion behavior in thin silicon-on-insulator (SOI) with a 200 nm top silicon layer were studied for different implantation energies and doses. Rutherford backscattering spectrometry in the channeling mode (RBS/C) was used to characterize the implant damage before and after annealing. Secondary ion mass spectrometry (SIMS) was used to study the indium transient enhanced diffusion (TED) behavior in the top Si layer of the SOI structure. An anomalous redistribution of indium after relatively high energy (200 keV) and dose (1 x 10"1"4 cm"-"2) implantation was observed in both bulk Si and SOI substrates. However, there exist differences in these two substrates that are attributable to the more predominant out-diffusion of indium as well as the influence of the buried oxide layer in the SOI structure.
2004-12-15
International Nuclear Information System (INIS)
Accurate modeling of the enhanced diffusion of boron during rapid thermal annealing has been accomplished by incorporating the effects of extended defect formation and annealing on enhanced diffusion into a multizone, semiempirical model. The multizone model divides the implant profile into three zones defining regions of different defects and diffusion enhancements. The model also contains the initial enhanced diffusion and the transient diffusion effects associated with the dissolution of defect clusters and the annealing of extended defects, respectively. The saturation time for transient-enhanced diffusion contains an exponential function of implant dose in order to model the increase in point defect generated with higher implant dose. As a result, the model accurately simulates the boron diffusion profile over a wide range of implant doses and also shows the immobile boron peak of precipitated ...
A study on yellow luminescence in O and C ion implanted GaN
International Nuclear Information System (INIS)
The effects of O and C ion implantation with different implantation doses on the yellow luminescence (YL) from unintentional doped n-type GaN have been studied by the photoluminescence (PL) spectra. O and C ions were implanted in the GaN samples with different doses from 1.0 x l013 to 1.0 x l017cm-2. Post-annealing was done in a quartz open-tube furnace under flowing N2 gas for 30 min at 950 degree C. By comparing with N ion implanted samples, it is assumed that different deep-level centers involving in the YL were produced in GaN after O and C ion implantation. In addition, with a dose of 1017 cm-2, the concentration of deep C centers involving in the YL was enhanced markedly. (authors)
2008-08-01
UK PubMed Central (United Kingdom)
BackgroundModern metal-on-metal hip resurfacing implants are being increasingly used for young and active patients, although the long-term outcome and failure mechanisms of these...Full Text Available
2010-06-01
Transient enhanced diffusion of Sb and B due to MeV silicon implants
Energy Technology Data Exchange (ETDEWEB)
We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si{sup +} ion implants at very high doses ({approx}10{sup 16}cm{sup {minus}2}). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation ({approx}700 at 740{degree}C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of {l_brace}311{r_brace} defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV ...
1997-06-01
Transient enhanced diffusion of Sb and B due to MeV silicon implants
International Nuclear Information System (INIS)
We measure the transient enhanced diffusion of shallow molecular-beam-epitaxy grown marker layers of Sb and B due to deep MeV Si"+ ion implants at very high doses (#approx#10"1"6cm"-"2). We expect the near-surface region of these implants to be vacancy rich, and we observe transient enhanced diffusion of Sb (the classic vacancy diffuser). The large enhancements imply a significant vacancy supersaturation (#approx#700 at 740 degree C). Double implantation of the high-dose MeV Si followed by a shallow (40 keV) Si implant and annealing produces a greatly reduced number of #left brace#311#right brace# defects compared to a 40 keV implant into virgin Si, again consistent with a vacancy-rich region in the near-surface region of an MeV implant. However, the shallow B marker layers also show transient enhanced diffusion for the same MeV implant ...
International Nuclear Information System (INIS)
In this paper, we report the systematic investigation on the melt characteristics of silicon during laser thermal processing (LTP) of amorphous silicon (a-Si) gates on ultrathin gate oxides. LTP is used to reduce the gate depletion effect in advanced semiconductor devices. The influence of implantation-induced damage and chemical inhomogeneities on the melt behavior of ion-implanted a-Si is studied using in situ time-resolved reflectance (TRR) measurements and ex situ secondary ion mass spectrometry. The results from TRR measurements indicate the presence of a buried melt for a-Si implanted with B"+ at a subamorphizing dose. In contrast, such a melt behavior is not observed during LTP of undoped a-Si and a-Si implanted with As"+ at an amorphizing dose. We attribute the marked difference in the melt characteristics to the competitive effects between compositional inhomogeneities and the extent of ...
2004-06-01
Sensitivity of psychophysical measures to signal processor modifications in cochlear implant users
UK PubMed Central (United Kingdom)
Experienced users of the Clarion cochlear implant were tested acutely with the HiResolution (HiRes) and HiRes Fidelity120 (F120) processing strategies. Three psychophysically-based tests were...Full Text Available
2010-04-01
Production and stability of implanted Pd-Si hydride
Energy Technology Data Exchange (ETDEWEB)
Combining in situ Rutherford backscattering and electrical transport measurements on low-temperature hydrogen-implanted amorphous Pd/sub 80/Si/sub 20/ films, we have studied the correlation between the hydrogen content and the resistivity.
1983-05-01
UK PubMed Central (United Kingdom)
BackgroundThe aim of this study is to examine how clinicians and patients negotiate clinical need and treatment decisions within a context of finite resources. Dental implant treatment...Full Text Available
UK PubMed Central (United Kingdom)
Nowadays, percutaneous pulmonary valve implantation is a successful alternative to surgery for patients requiring treatment of pulmonary valve dysfunction. However, owing to the wide variety of implantation...Full Text Available
2010-06-28
Noise Susceptibility of Cochlear Implant Users: The Role of Spectral Resolution and Smearing
UK PubMed Central (United Kingdom)
The latest-generation cochlear implant devices provide many deaf patients with good speech recognition in quiet listening conditions. However, speech recognition deteriorates rapidly as the level of...Full Text Available
2005-03-01
Mechanism for the reduction of interstitial supersaturations in MeV-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
We demonstrate that the excess vacancies induced by a 1 MeV Si implant reduce the excess interstitials generated by a 40 keV Si implant during thermal annealing when these two implants are superimposed in silicon. It is shown that this previously observed reduction is dominated by vacancy annihilation and not by gettering to deeper interstitial-type extended defects. Interstitial supersaturations were measured using B doping superlattices (DSL) grown on a silicon-on-insulator (SOI) substrate. Implanting MeV and keV Si ions into the B DSL/SOI structure eliminated the B transient enhanced diffusion normally associated with the keV implant. The buried SiO{sub 2} layer in the SOI substrate isolates the deep interstitials-type extended defects of the MeV implant, thereby eliminating the possibility that these defects getter the interstitial excess induced by the keV ...
1999-03-01
Mechanism for the reduction of interstitial supersaturations in MeV-implanted silicon
International Nuclear Information System (INIS)
We demonstrate that the excess vacancies induced by a 1 MeV Si implant reduce the excess interstitials generated by a 40 keV Si implant during thermal annealing when these two implants are superimposed in silicon. It is shown that this previously observed reduction is dominated by vacancy annihilation and not by gettering to deeper interstitial-type extended defects. Interstitial supersaturations were measured using B doping superlattices (DSL) grown on a silicon-on-insulator (SOI) substrate. Implanting MeV and keV Si ions into the B DSL/SOI structure eliminated the B transient enhanced diffusion normally associated with the keV implant. The buried SiO_2 layer in the SOI substrate isolates the deep interstitials-type extended defects of the MeV implant, thereby eliminating the possibility that these defects getter the interstitial excess induced by the keV Si ...
1999-03-01
UK PubMed Central (United Kingdom)
The effect of feedback and materials on perceptual learning was examined in normal hearing listeners exposed to cochlear implant simulations. Generalization was most robust when feedback paired...Full Text Available
2010-02-01
UK PubMed Central (United Kingdom)
BackgroundOne-stage implant placement has clinically acceptable treatment outcomes. Among other advantages, it may allow investigation of early wound healing. The...Full Text Available
2008-10-01
UK PubMed Central (United Kingdom)
The temporal fine structure (TFS) of sound contributes significantly to the perception of music and speech in noise. The evaluation of new strategies to improve TFS delivery in cochlear implants (CIs)...Full Text Available
2008-03-01
UK PubMed Central (United Kingdom)
Although collagen-containing implants are widely used in various surgical applications, there has been relatively little attention paid to the possibility that this type of biomaterial may undergo pathologic...Full Text Available
1986-01-01
Observation of a surface peak in low energy implant depth profiles in silicon
Energy Technology Data Exchange (ETDEWEB)
In situ Auger sputter depth profiles of saturation implants of 3 keV N/sub 2//sup +/ in silicon at room temperature exhibit a sharp peak in the nitrogen concentration in the outermost layers, followed by a monotonic decrease. No broad plateau was observed. The energy of the Auger line corresponding to the Si(2p) core electron excitation, monitored throughout the profiling, exhibits a chemical shift of up to 7 eV at the surface peak concentration. Inert gas ion post-bombardment of unsaturated implants significantly modifies the profile, and supports the suggestion that the surface peak arises through radiation enhanced diffusion of implanted atoms.
1984-03-01
NEUROPLASTICITY and INNOVATION
OF VOCALIZED SPEECH THROUGH. ANALYSIS OF NEURAL SIGNALS. " SYNTHETIC TELEPATHY- WIRELESS. TRANSMISSION OF DECODED. THOUGHTS. " IMPLANTABLE MEMORY-ELIMINATES ...
Interstitial injection in silicon after high-dose, low-energy arsenic implantation and annealing
International Nuclear Information System (INIS)
In this work, we investigate the interstitial injection into the silicon lattice due to high-dose, low-energy arsenic implantation. The approach consists in monitoring the diffusion of the arsenic profile as well as of the boron profile in buried #delta#-doped layers, when amounts of the as-implanted arsenic profile are removed by low-temperature wet silicon etching. The experimental results indicate that the contribution of the implantation damage to the transient enhanced diffusion of boron, and thus the interstitial injection, is not the main one. On the contrary, interstitial generation due to arsenic clustering seems to be more important for the present conditions.
2005-11-14
... central venous catheters (tunneled [eg, Hickman], subcutaneously implanted [eg, Porta-cath], and nontunneled), peripherally inserted central venous catheters ...
Alignment accuracy of focused ion beam implantation
Energy Technology Data Exchange (ETDEWEB)
The theoretical alignment limit for focused ion beam (FIB) implantation was deduced from the calculated resolution for the detection of an alignment mark. The alignment resolution varies with the signal to noise ratio and there is an optimum current which gives the best resolution. The alignment resolution epsilon/sub sigma/ is approximately 0.006 ..mu..m for a 160 keV Si/sup ++/ beam from our FIB implanter. The measured alignment error is approximately 0.06 ..mu..m and the main reason of this discrepancy is vibration. The ultimate limit on the alignment error can be reached through improvements in the implanter system.
1987-06-01
Energy Technology Data Exchange (ETDEWEB)
Amorphization and a dual implant technique have been used to manipulate residual defects that persist following implantation and post-implant thermal treatments. Residual defects can often be attributed to ion-induced defect excesses. A defect is considered to be excess when it occurs in a localized region at a concentration greater than its complement. Sources of excess defects include spatially separated Frenkel pairs, excess interstitials resulting from the implanted atoms, and sputtering. Preamorphizing prior to dopant implantation has been proposed to eliminate dopant broadening due to ion channeling as well as dopant diffusion during subsequent annealing. However, transient-enhanced diffusion (TED) of implanted boron has been observed in pre-amorphized Si. The defects driving this enhanced boron diffusion are thought to be the extended interstitial-type ...
1999-06-01
International Nuclear Information System (INIS)
Amorphization and a dual implant technique have been used to manipulate residual defects that persist following implantation and post-implant thermal treatments. Residual defects can often be attributed to ion-induced defect excesses. A defect is considered to be excess when it occurs in a localized region at a concentration greater than its complement. Sources of excess defects include spatially separated Frenkel pairs, excess interstitials resulting from the implanted atoms, and sputtering. Preamorphizing prior to dopant implantation has been proposed to eliminate dopant broadening due to ion channeling as well as dopant diffusion during subsequent annealing. However, transient-enhanced diffusion (TED) of implanted boron has been observed in pre-amorphized Si. The defects driving this enhanced boron diffusion are thought to be the extended interstitial-type ...
1999-06-01
On the theory of transient enhanced diffusion in boron-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
Transient enhanced diffusion in boron-implanted silicon is interpreted as being due to the fact that during rapid thermal annealing a relaxation process takes place, associated with quasi-chemical reactions including defects. A simple analytical model makes it possible to describe the annealing mechanism on a microscopic scale in terms of reaction-diffusion processes. The measured dependences of the boron diffusion coefficient of the enhanced diffusion on time, temperature and implantation energy are satisfactorily explained. (author).
1991-01-01
On the theory of transient enhanced diffusion in boron-implanted silicon
International Nuclear Information System (INIS)
Transient enhanced diffusion in boron-implanted silicon is interpreted as being due to the fact that during rapid thermal annealing a relaxation process takes place, associated with quasi-chemical reactions including defects. A simple analytical model makes it possible to describe the annealing mechanism on a microscopic scale in terms of reaction-diffusion processes. The measured dependences of the boron diffusion coefficient of the enhanced diffusion on time, temperature and implantation energy are satisfactorily explained. (author).
International Nuclear Information System (INIS)
In this article carbon co-implantation and step-by-step thermal treatments of shallow p"+-n-junctions formation were used with the purpose of extended defect suppression and reduction of boron transient enhanced diffusion. A substantial improvement of the structural and electrical parameters of shallow p"+-n-junctions has been achieved by using the additional carbon implantation and step-by-step thermal treatments. (authors)
Implantation-plasma treatment of martensitic steel and titanium alloy
Energy Technology Data Exchange (ETDEWEB)
One of the effective methods of deep modification of the surface of steels and alloys is the combination of ion implantation and plasma nitriding. In this work, the long-range effect is demonstrated in the case of combination of the effect of high- and low-energy ions of nitrogen on a martensitic steel for each ion implantation is usually not effective, and a titanium alloy used widely in industry.
2001-07-01
Energy Technology Data Exchange (ETDEWEB)
Corn is the main source for biofuel production in North America. However, both sweet pearl millet and sweet sorghum crops represent an interesting alternative to corn for ethanol production because of their high biomass yield under a wide range of environmental conditions and high concentration of readily fermentable sugars. Coproducts such as pressing residues can be also be utilized so that nothing is lost in the process. However, in order to improve the extraction of juice for ethanol production, the pressing process of this biomass must be optimized. Preliminary experiments were therefore conducted to optimize the juice extraction from sweet pearl millet and sweet sorghum using 2 different presses, notably a screw press and a manually operated hydraulic press. Both types of biomass were either chopped finely or coarsely and were exposed to various pressures with the hydraulic press. The volume of juice extracted from both crops increased linearly with ...
2010-07-01
Energy Technology Data Exchange (ETDEWEB)
In the last few years the supercharging of Otto-cycle-engines has regained popularity, as demonstrated by a number of series-production engines. After listing the aims to be met by a modern supercharger the paper describes the technical status of mass-produced or close to production superchargers. This is followed by a comparative evaluation of the systems, enabling the reader to select possible solutions for a projected supercharger-engine-system by means of a comparison chart. The paper is concluded by a list of possible directions for further development and additional potential for twin-screw superchargers. (orig.) [German] In neuerer Zeit hat die Aufladung von Ottomotoren wieder ein verstaerktes Interesse gefunden, das sich auch in einer Anzahl serienmaessig gefertigter aufgeladener Motortypen wiederspiegelt. Der vorliegende Beitrag beschreibt, nach einer Darstellung der Anforderungen an ein modernes Aufladegeraet, den Stand der Technik bei serienmaessigen ...
2001-07-01
International Nuclear Information System (INIS)
The lateral bearing device is made of 7 lateral supports, each positioned to allow the displacement of the steam generator due to thermal or seismic effects. Each support includes a buffer plate that can be positioned on the steam generator using a position control assembly. This control assembly consists of a screw jack arrangement where the nut is fastened via an energy absorbing layer to a footplate that is fixed to the concrete wall of the steam generator enclosure. 4 figs.
1992-03-31
R and D on Control Rod Magnetic Suspension Drive Mechanism of CARR
Energy Technology Data Exchange (ETDEWEB)
This paper deal with the research and develop (R and D) on Control Rod Magnetic Suspension Drive Mechanism (MSDM) of CARR. The MSDM is made up of tube, coil, armature, step motor, lead screw etc. The MSDM use electromagnetics as its main principle. The open solenoid electromagnet technique is employed to implement suspension function. It has advantages of high drive precision, high safety feature, good running reliability, easy maintenance and good economical property. The R and D process of MSDM has three phases including single coil electromagnet, principle prototype and engineering prototype. (author)
2011-07-01
The effect of excimer laser pretreatment on diffusion and activation of boron implanted in silicon
International Nuclear Information System (INIS)
We have investigated the effect of excimer laser annealing (ELA) on transient enhanced diffusion (TED) and activation of boron implanted in Si during subsequent rapid thermal annealing (RTA). It is observed that ELA with partial melting of the implanted region causes reduction of TED in the region that remains solid during ELA, where the diffusion length of boron is reduced by a factor of #approx#4 as compared to the as-implanted sample. This is attributed to several mechanisms such as liquid-state annealing of a fraction of the implantation induced defects, introduction of excess vacancies during ELA, and solid-state annealing of the defects beyond the maximum melting depth by the heat wave propagating into the Si wafer. The ELA pretreatment provides a substantially improved electrical activation of boron during subsequent RTA.
2005-11-07
Status and progress in ion implantation technology for semiconductor device manufacturing
International Nuclear Information System (INIS)
Rapid growth in implant applications in the fabrication of semiconductors has encouraged a dramatic increase in the range of energies, beam currents and ion species used. The challenges of a wider energy range, higher beam currents, continued reduction in contamination, improved angle integrity and larger substrates have motivated the development of many innovations. Advanced processes in submicron device production uses up to twenty implantation steps. Thus the outstanding growth of this industry has led to the evolution of a thriving business of hundreds of implantation equipment systems each year with very specific requirements. The present paper reviews the principal process requirements which resulted in the evolution of the equipment technology, and describes the recent trends in the ion implanter technology all three principal categories: high current, medium current and high energy. (author)
1998-12-08
RHEED, AES and XPS studies of the passive films formed on ion implanted stainless steel
International Nuclear Information System (INIS)
P-implantation (10"1"7 ions cm"-"2, 40 KeV) into 304 stainless steel (ss) has been carried out, and an amorphous surface alloy was formed. Polarization studies in deaerated 1N H_2SO_4+ 2% NaCl showed that P-implantation improved both the general and localized corrosion resistance of 304 ss. A comparative study has been carried out between the implanted and unimplanted steel to determine what influence P-implantation has upon the properties of the passive film formed 1N H_2SO_4. The influence of Cl ions on pre-formed passive films was also studied. RHEED, XPS and AES were used to evaluate the nature of the passive films formed in these studies.
2005-05-26
RHEED, AES and XPS studies of the passive films formed on ion implanted stainless steel
Energy Technology Data Exchange (ETDEWEB)
P-implantation (10/sup 17/ ions cm/sup -2/, 40 KeV) into 304 stainless steel (ss) has been carried out, and an amorphous surface alloy was formed. Polarization studies in deaerated 1N H/sub 2/SO/sub 4/+ 2% NaCl showed that P-implantation improved both the general and localized corrosion resistance of 304 ss. A comparative study has been carried out between the implanted and unimplanted steel to determine what influence P-implantation has upon the properties of the passive film formed 1N H/sub 2/SO/sub 4/. The influence of Cl ions on pre-formed passive films was also studied. RHEED, XPS and AES were used to evaluate the nature of the passive films formed in these studies.
1981-12-01
Photosensitivity and imaging characteristics of ion-implanted PLZT ceramics
International Nuclear Information System (INIS)
We reported in previous papers that both the near-uv and the visible photosensitivities of ferroelectric-phase PLZT (lead lanthanum zirconate titanate) ceramics are increased by as much as four orders of magnitude by ion implantation or a combination of thermal diffusion of Al and ion implantation. New results are presented here on high-energy (1 MeV) implants of Al and Ni and coimplants of Al + Ne and Ni + Ne, and these results are compared with earlier 500 keV implants of Al and Cr and coimplants of Al + Ne and Cr + Ne as surface modification techniques for increasing the visible photosensitivity of PLZT. The important role of grain size in determining optimum contrast and resolution of stored optical information is described in terms of new experimental results.
1985-08-12
Ion implantation into concave polymer surface
Energy Technology Data Exchange (ETDEWEB)
A new technique for ion implantation into concave surface of insulating materials is proposed and experimentally studied. The principle is roughly described by referring to modifying inner surface of a PET (polyethylene terephthalate) bottle. An electrode that is supplied with positive high-voltage pulses is inserted into the bottle. Both plasma formation and ion implantation are simultaneously realized by the same high-voltage pulses. Ion sheath with a certain thickness that depends on plasma parameters is formed just on the inner surface of the bottle. Since the plasma potential is very close to that of the electrode, ions from the plasma are accelerated in the sheath and implanted perpendicularly into the bottle's inner surface. Laser Raman spectroscopy shows that the inner surface of an ion-implanted PET bottle is modified into DLC (diamond-like carbon). Gas permeation measurement shows ...
2006-01-15
International Nuclear Information System (INIS)
It has been demonstrated that, by incorporating a thin #approx#20 nm Si_1_-_yC_y (with y as low as 0.1%) layer at the deep indium implant end-of-range (EOR) region, the EOR defects and enhanced diffusion behavior associated with indium implant can be eliminated. The Si_1_-_yC_y layer was grown epitaxially followed by a silicon epitaxy cap of 60 nm. Indium implantations were performed at 1x10"1"4 cm"-"2 at 115 keV followed by spike annealing at 1050 deg. C. The experimentally observed EOR defect and enhanced diffusion elimination are explained based on the undersaturation of implantation-induced silicon interstitials with the presence of substitutional carbon at the Si_1_-_yC_y layer.
2003-11-17
In-vitro evaluation of corrosion resistance of nitrogen ion implanted titanium simulated body fluid
International Nuclear Information System (INIS)
Titanium and its alloy Ti6Al4V enjoy widespread use in various biomedical applications because of favourable local tissue response, higher corrosion resistance and fatigue strength than the stainless steels and cobalt-chromium alloy previously used. The study reported in this paper aims to optimize the conditions of nitrogen ion implantation on commercially pure titanium and to correlate the implantation parameters to the corrosion resistance. X-ray photoelectron spectroscopy was used to analyse surface concentration and the implantation processes. An improvement in the electrochemical behaviour of the passive film was shown to occur with nitrogen ion implantation on titanium, in simulated body fluids. (UK).
Energy Technology Data Exchange (ETDEWEB)
A model is presented to account for the effects of ion-induced defects during implantation processing of Si. It will be shown that processing is quite generally affected by the presence of defect excesses rather than the total number of defects. a defect is considered excess if it represents a surplus locally of one defect type over its compliment. Processing spanning a wide range of implantation conditions will be presented to demonstrate that the majority of the total defects played little or no role in the process. This is a direct result of the ease with which the spatially correlated Frenkel pairs recombine either dynamically or during a post-implantation annealing. Based upon this model, a method will be demonstrated for manipulating or engineering the excess defects to modify their effects. In particular high-energy, self-ions are shown to inject vacancies into a boron implanted region resulting ...
1997-05-01
Effect of recoil implantation of oxygen on boron enhanced diffusion in silicon
International Nuclear Information System (INIS)
In device fabrication, dopants are frequently implanted into silicon through silicon dioxide masks. A consequence of this technique is the co-implantation of recoiled oxygen into the substrate. This study investigates the effect of recoiled oxygen on the widely observed transient enhanced boron diffusion. Comparison of the spreading resistance profiles of annealed through-oxide and directly implanted samples reveals that transient enhanced diffusion of boron can be suppressed by the former process. Continued annealing of the through-oxide implanted silicon recovers the enhanced diffusion of boron. This behavior is believed to be due to precipitation of recoiled oxygen. The mechanisms leading to the above observations are discussed and transmission electron microscopy support presented. 11 refs., 5 figs.
1989-04-25
Bacterial adhesion reduction on a biocompatible Si^+ ion implanted austenitic stainless steel
British Library Electronic Table of Contents (United Kingdom)
The colonization of an implant surface by bacteria is an extremely important medical problem, which often leads to the failure of medical devices. Modern surface modification techniques, such as ion implantation, can confer to the surfaces very different properties from those of the bulk underlying material. In this work, austenitic stainless steel 316 LVM has been superficially modified by Si^+ ion implantation. The effect of surface modification on the biocompatibility and bacterial adhesion to 316 LVM stainless steel has been investigated. To this aim, human mesenchymal stem cells (hMSCs), as precursor of osteoblastic cells, and bacterial strains relevant in infections related to orthopedic implants, i.e., Staphylococcus aureus and Staphylococcus epidermidis, have been assayed. For the ...
2011-01-01
Annealing of silicon implanted with arsine and hydrogen ions
Energy Technology Data Exchange (ETDEWEB)
Arsenic and hydrogen ions produced from a mixture of arsine and hydrogen gas were implanted with a dose of 3 x 10{sup 15} As{sup +} ions/cm{sup 2} into silicon using an ion-shower implanter. The dominant ionic species implanted into the silicon were As{sub 2}H{sup +}, AsH{sup +}, H{sub 5}{sup +}, and H{sub 3}{sup +} ions. Arsenic atoms diffused into the silicon with large diffusion coefficients during annealing at 700 and 800 C. However, when the implanted silicon was annealed at 900 C, the arsenic atoms diffused into a deeper region in the silicon with a very small diffusion coefficient that was independent of concentration. (Abstract Copyright [2003], Wiley Periodicals, Inc.)
2003-01-01
Field simulation of axisymmetric plasma screw pinches by alternating-direction-implicit methods
Energy Technology Data Exchange (ETDEWEB)
An axisymmetric plasma screw pinch is an axisymmetric column of ionized gaseous plasma radially confined by forces from axial and azimuthal currents driven in the plasma and its surroundings. This dissertation is a contribution to detailed, high resolution computer simulation of dynamic plasma screw pinches in 2-d {ital rz}-coordinates. The simulation algorithm combines electron fluid and particle-in-cell (PIC) ion models to represent the plasma in a hybrid fashion. The plasma is assumed to be quasineutral; along with the Darwin approximation to the Maxwell equations, this implies application of Ampere`s law without displacement current. Electron inertia is assumed negligible so that advective terms in the electron momentum equation are ignored. Electrons and ions have separate scalar temperatures, and a scalar plasma electrical resistivity is assumed. Altemating-direction-implicit (ADI) methods are used to advance the electron fluid drift ...
1996-06-01
XPS study of the passive films formed on nitrogen-implanted austenitic stainless steels
Energy Technology Data Exchange (ETDEWEB)
Austenitic stainless steels (304-type) have been implanted with nitrogen ions in order to investigate the effects of implanted nitrogen on their electrochemical behaviour and on the nature of the passive film formed on the steels in acid (0.5M H{sub 2}SO{sub 4}). Alloys with two nitrogen doses have been prepared (2.5x10{sup 16} and 2x10{sup 17} N atoms/cm{sup 2}). The implanted alloys have been characterized by {sup 15}N-NRA (nuclear reaction analysis) and XPS (X-ray photoelectron spectroscopy). Alloy surfaces with well-defined N concentrations were prepared, prior to the electrochemical measurements, by argon-ion sputtering of the implanted material for a fixed time in order to reach a well-defined point on the nitrogen depth profile. The samples were then transferred without exposure to air to an electrochemical cell mounted in an inert gas glove box. The implanted nitrogen ...
1992-05-01
XPS study of the passive films formed on nitrogen-implanted austenitic stainless steels
International Nuclear Information System (INIS)
Austenitic stainless steels (304-type) have been implanted with nitrogen ions in order to investigate the effects of implanted nitrogen on their electrochemical behaviour and on the nature of the passive film formed on the steels in acid (0.5M H_2SO_4). Alloys with two nitrogen doses have been prepared (2.5x10"1"6 and 2x10"1"7 N atoms/cm"2). The implanted alloys have been characterized by "1"5N-NRA (nuclear reaction analysis) and XPS (X-ray photoelectron spectroscopy). Alloy surfaces with well-defined N concentrations were prepared, prior to the electrochemical measurements, by argon-ion sputtering of the implanted material for a fixed time in order to reach a well-defined point on the nitrogen depth profile. The samples were then transferred without exposure to air to an electrochemical cell mounted in an inert gas glove box. The implanted nitrogen modifies the electrochemical ...
1992-01-01
Modification of the passivity of iron based alloys through ion implantation
International Nuclear Information System (INIS)
As an unconventional surface alloying process, ion implantation has been utilized to improve the active-passive behavior and the pitting resistance of martensitic M50 engineering alloy. In a field simulation study, Cr-implantation only at 150 kev to a fluence of 2 x 10"1"7 ions/cm"2 prevented pitting. The best pitting resistance of the steel was obtained with multiple implantations of Cr and Mo. The intermixing effect of high fluence P-implantation into 304 stainless produced an amorphous surface alloy. The removal of the grain boundaries and the uniformity of the resulting structure had a great influence on corrosion properties. REED analysis indicated that the anodic passive films formed on P-implanted 304 stainless steel at 250 mV (SCE) in 0.5M H_2SO_4 was amorphous. Phosphorus and boron were implanted into 316 stainless steel to study the passivity of 316 ...
1764-01-01
Modelisation of boron diffusion from ultra-low-energy implantation in crystalline silicon
Energy Technology Data Exchange (ETDEWEB)
We have investigated and modeled the boron diffusion in silicon following ultra-low-energy implantation (500 eV). It is well known that reducing implant energies is an effective way to eliminate transient enhanced diffusion due to the excess of interstitials from the implant. However, for sub-keV B implants diffusion remains enhanced. This enhancement is linked to the presence of a silicon boride layer located at the silicon surface which creates interstitials. This phenomenon is named 'boron enhanced diffusion' (BED). The BED effect is of obvious interest since it counteracts the advantage obtained by reducing the ion implantation energy. For these reasons, we have investigated the diffusion of low-energy boron implanted in crystalline silicon and tested a complete simulation program, which takes into account the effect of boron precipitation ...
2003-12-31
Implantation damage and anomalous diffusion of implanted boron in silicon through SiO_2 films
International Nuclear Information System (INIS)
Boron is implanted in crystalline silicon through oxide layers with different thicknesses. The implantation is carried out at various doses and energies of interest in ultra large scale integration (ULSI) application. Rapid thermal annealings (RTA) are used to obtain shallow junctions and electrical activation of the B atoms. However, transient enhanced diffusion induced by implantation damage can be observed. The boron concentration profiles before and after annealing are obtained with secondary ion mass spectrometry (SIMS). It is found that the diffusion transient in the tail region of the boron profile increases with decreasing oxide thickness. Even more, if the implantation damage concerns mostly the oxide, i.e. when the concentration peak is located in this oxide, the oxygen knocked into the silicon substrate could play this way an important role in restricting the boron diffusion, which is good to ...
Implantation damage and anomalous diffusion of implanted boron in silicon through SiO[sub 2] films
Energy Technology Data Exchange (ETDEWEB)
Boron is implanted in crystalline silicon through oxide layers with different thicknesses. The implantation is carried out at various doses and energies of interest in ultra large scale integration (ULSI) application. Rapid thermal annealings (RTA) are used to obtain shallow junctions and electrical activation of the B atoms. However, transient enhanced diffusion induced by implantation damage can be observed. The boron concentration profiles before and after annealing are obtained with secondary ion mass spectrometry (SIMS). It is found that the diffusion transient in the tail region of the boron profile increases with decreasing oxide thickness. Even more, if the implantation damage concerns mostly the oxide, i.e. when the concentration peak is located in this oxide, the oxygen knocked into the silicon substrate could play this way an important role in restricting the boron diffusion, which is good to ...
1993-07-16
Enhanced diffusion of dopants in vacancy supersaturation produced by MeV implantation
Energy Technology Data Exchange (ETDEWEB)
The diffusion of Sb and B markers has been studied in vacancy supersaturations produced by MeV Si implantation in float zone (FZ) silicon and bonded etch-back silicon-on-insulator (BESOI) substrates. MeV Si implantation produces a vacancy supersaturated near-surface region and an interstitial-rich region at the projected ion range. Transient enhanced diffusion (TED) of Sb in the near surface layer was observed as a result of a 2 MeV Si{sup +}, 1 {times} 10{sup 16}/cm{sup 2}, implant. A 4{times} larger TED of Sb was observed in BESOI than in FZ silicon, demonstrating that the vacancy supersaturation persists longer in BESOI than in FZ. B markers in samples with MeV Si implant showed a factor of 10{times} smaller diffusion relative to markers without the MeV Si{sup +} implant. This data demonstrates that a 2 MeV Si{sup +} implant injects vacancies into the near ...
1997-04-01
Doping of silicon carbide by ion implantation
Energy Technology Data Exchange (ETDEWEB)
A brief survey is given of some recent results on doping of 4H- and 6H-SiC by ion implantation. The doses and energies used are between 10{sup 9} and 10{sup 15} cm{sup -2} and 100 keV and 5 MeV, respectively, and B and Al ions (p-type dopants) are predominantly studied. After low dose implantation ({<=}10{sup 10} cm{sup -2}) a strong compensation is observed in n-type samples and this holds irrespective of implantation temperature up to 600 C. However, at higher doses (10{sup 14}-10{sup 15} Al/cm{sup 2}) the rate of defect recombination (annihilation) increases substantially during hot implants ({>=}200 C), and in these samples one type of structural defect dominates after post-implant annealing at 1700-2000 C. The defect is identified as a dislocation loop composed of clustered interstitial atoms inserted on the basal plane in the hexagonal crystal structure. Finally, ...
2001-07-01
British Library Electronic Table of Contents (United Kingdom)
This study examines the degree of price-integration of equity indices between the major markets of Africa, namely Morocco, Tunisia, Egypt, Kenya, Nigeria, Namibia and South Africa with the European markets of London and Paris. Vector Autoregressive and Autoregressive Distributed Lag methods reveal that African markets are largely price-segmented. The only markets that are price-integrated have shared economic and financial institutions, such as Namibia and South Africa, and Egypt, Tunisia and France. The evidence suggests that development policy should be focussed on enhancing existing institutions rather than embarking prematurely on regional integration.
2012-01-01
Stratigraphy and sedimentary environment of the Coalspur Formation
Energy Technology Data Exchange (ETDEWEB)
The Coalspur Formation is a continental succession of interbedded mudstone, siltstone and fine grained sandstone with subordinate coarser grained sandstone layers and channel lag deposits. Chert-pebble conglomerate (the Entrance conglomerate) occurs at the base of the formation, and coal beds interbedded with coaly shale and numerous thin bentonites occur in the upper part of the formation. An economically significant amount of high-quality thermal coal occurs within the upper, Paleocene part of the formation named the Coalspur coal zone. Coal from this zone, also known as the Coal Valley coal zone is being exploited in the Coal Valley Mine. 17 refs., 4 figs.
1990-01-01
Refinement of conventional PSS design in multimachine system by modal analysis
The design of the lead/lag network in a conventional power system stabilizer (PSS) is intended to provide the correct compensation in order to obtain an electrical torque component in phase with the speed variation. It is shown that, for a multimachine system, the conventional design analysis and synthesis tend to oversimplify the system representation and hence the interaction effects. A more rigorous approach is preferred considering four torque (or power) components instead of the conventional single component. Based on modal analysis, the significance of these other components is revealed, the more comprehensive treatment using a generalized multimachine representation is justified and a reliable means for optimizing the PSS parameters is explained.
1993-05-01
Frequency response characteristics of the fuzzy polar power system stabilizer
Energy Technology Data Exchange (ETDEWEB)
The fuzzy polar power system stabilizer (FPPSS) which has been recently developed is analyzed using frequency domain methods. the frequency domain approach allows the PSS designer to compare the new FPPSS with more conventional controllers. The significance of the three FPPSS design parameters are readily seen from the frequency response data, and their relationship to the conventional lead-lag design approach can be evaluated. Furthermore, the frequency response data for the FPPSS allows an alternate design approach for this stabilizer, and can be used to develop information concerning the small signal stability of the resulting system.
1995-06-01
Accelerating the output of technology for auxillary processes in open cast mines
Energy Technology Data Exchange (ETDEWEB)
An analysis of the current state of track-laying operations in open-cut mines is given and their labor intensive nature is noted. The lag in the technological development of mechanization equipment for track laying and repair operations is noted. Results are given from developments by the Scientific Research Institute of Open-Pit Mining Operations in the field of mobile transportation technology and promising modular route design. Also examined are the problems of improving the routing bases in the industry. The absence of factories for manufacturing transportation technology and equipment is reflected most evidently in the technical and cost characteristics of coal production by an open-cut method and requires immediate solution.
1984-01-01
Pentobarbital anesthesia alters neural responses in the precedence effect.
The precedence effect (PE) is thought to be beneficial for proper localization and perception of sounds. The majority of recent physiological studies focus on the neural discharges correlated with PE in the inferior colliculus (IC). Pentobarbital anesthesia is widely used in physiological studies. However, little is known of the effect of pentobarbital on the discharge of neurons in PE. Neuronal responses in the IC from 23 male SD rats were recorded by standard extracellular recording techniques following presentation of 4 ms white noise bursts, presented from either or both of two loud speakers, at different interstimulus delays (ISDs). The neural responses were recorded for off-line analysis before or after intraperitoneal administration of pentobarbital at a loading or maintenance dose. Data were assessed by one-way repeated measures analysis of variance and pairwise comparisons. When the ipsilateral stimuli were leading, pentobarbital at a loading dose significantly increased ...
2011-05-06
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5{times}10{sup 12} to 1{times}10{sup 14}/cm{sup 2} evolves into a distribution of {l_brace}311{r_brace} interstitial agglomerates during the initial annealing stages at 670{endash}815{degree}C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of ...
1997-05-01
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
International Nuclear Information System (INIS)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, transmission electron microscopy measurements of implantation damage were combined with B diffusion experiments using doping marker structures grown by molecular-beam epitaxy (MBE). Damage from nonamorphizing Si implants at doses ranging from 5x10"1"2 to 1x10"1"4/cm"2 evolves into a distribution of #left brace#311#right brace# interstitial agglomerates during the initial annealing stages at 670 endash 815 degree C. The excess interstitial concentration contained in these defects roughly equals the implanted ion dose, an observation that is corroborated by atomistic Monte Carlo simulations of implantation and annealing processes. The injection of interstitials from ...
Understanding and controlling transient enhanced dopant diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during initial annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, the authors have used B doping marker layers in Si to probe the injection of interstitials from near-surface, non-amorphizing Si implants during annealing. The in-diffusion of interstitials is limited by trapping at impurities and has an activation energy of {approximately}3.5 eV. Substitutional C is the dominant trapping center with a binding energy of 2--2.5 eV. The high interstitial supersaturation adjacent to the implant damage drives substitutional B into metastable clusters at concentrations below the B solid solubility limit. Transmission electron microscopy shows that the interstitials driving TED are emitted from {l_brace}311{r_brace} defect clusters in the damage region at a rate which ...
1995-12-31
Understanding and controlling transient enhanced dopant diffusion in silicon
International Nuclear Information System (INIS)
Implanted B and P dopants in Si exhibit transient enhanced diffusion (TED) during initial annealing which arises from the excess interstitials generated by the implant. In order to study the mechanisms of TED, the authors have used B doping marker layers in Si to probe the injection of interstitials from near-surface, non-amorphizing Si implants during annealing. The in-diffusion of interstitials is limited by trapping at impurities and has an activation energy of #approx#3.5 eV. Substitutional C is the dominant trapping center with a binding energy of 2--2.5 eV. The high interstitial supersaturation adjacent to the implant damage drives substitutional B into metastable clusters at concentrations below the B solid solubility limit. Transmission electron microscopy shows that the interstitials driving TED are emitted from #left brace#311#right brace# defect clusters in the damage region at a rate which ...
The effect of boron implant energy on transient enhanced diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
Transient enhanced diffusion (TED) of boron in silica after low energy boron implantation and annealing was investigated using boron-doping superlattices (DSLs) grown by low temperature molecular beam epitaxy. Boron ions were implanted at 5, 10, 20, and 40 keV at a constant dose of 2{times}10{sup 14}/cm{sup 2}. Subsequent annealing was performed at 750{degree}C for times of 3 min, 15 min, and 2 h in a nitrogen ambient. The broadening of the boron spikes was measured by secondary ion mass spectroscopy and simulated. Boron diffusivity enhancement was quantified as a function of implant energy. Transmission electron microscopy results show that {l_angle}311{r_angle} defects are only seen for implant energies {ge}10 keV at this dose and that the density increases with energy. DSL studies indicate the point defect concentration in the background decays much slower when {l_angle}311{r_angle} defects are ...
1997-02-01
British Library Electronic Table of Contents (United Kingdom)
Downregulation of anterior pituitary GnRH-receptors by application of a slow release GnRH-implant offers an effective and reversible alternative to surgical castration of the male dog. Aim of the present study was to test the efficacy and the underlying mechanisms of a new non-biodegradable controlled-release device implant (Gonazon, Intervet, containing 18.5mg of the GnRH-agonist Azagly-Nafarelin). Eight male beagle dogs were implanted s.c. at the para-umbilical region. In four dogs implant removal was after 180 days (group 1), in the other four dogs after 365 days (group 2). Eleven weeks after implantation availability of LH was reduced (p<0.0001) by 70%. After an initial increase lasting for about 4 days, testosterone (T) and estradiol (E2) concentrations decreased (p<0.0001) to basal l...
2009-01-01
Energy Technology Data Exchange (ETDEWEB)
The reduction of transient enhanced diffusion (TED) with reduced implantation energy has been investigated and quantified. A fixed dose of 1{times}10{sup 14} cm{sup {minus}2} Si{sup +} was implanted at energies ranging from 0.5 to 20 keV into boron doping superlattices and enhanced diffusion of the buried boron marker layers was measured for anneals at 810, 950, and 1050{degree}C. A linearly decreasing dependence of diffusivity enhancement on decreasing Si{sup +} ion range is observed at all temperatures, extrapolating to {approximately}1 for 0 keV. This is consistent with our expectation that at zero implantation energy there would be no excess interstitials from the implantation and hence no TED. Monte Carlo modeling and continuum simulations are used to fit the experimental data. The results are consistent with a surface recombination length for interstitials of {lt}10 nm. The data presented here ...
1997-11-01
International Nuclear Information System (INIS)
The reduction of transient enhanced diffusion (TED) with reduced implantation energy has been investigated and quantified. A fixed dose of 1x10"1"4 cm"-"2 Si"+ was implanted at energies ranging from 0.5 to 20 keV into boron doping superlattices and enhanced diffusion of the buried boron marker layers was measured for anneals at 810, 950, and 1050 degree C. A linearly decreasing dependence of diffusivity enhancement on decreasing Si"+ ion range is observed at all temperatures, extrapolating to #approx#1 for 0 keV. This is consistent with our expectation that at zero implantation energy there would be no excess interstitials from the implantation and hence no TED. Monte Carlo modeling and continuum simulations are used to fit the experimental data. The results are consistent with a surface recombination length for interstitials of <10 nm. The data presented here demonstrate that in the range of ...
Energy Technology Data Exchange (ETDEWEB)
Excellent silicided shallow p{sup +}n junctions have been successfully achieved by the implantation of BF{sub 2}{sup +} ions into thin Pd{sub 2}Si films on Si substrates to a dose of 5 {times} 10{sup 15} cm{sup {minus}2} and subsequent low temperature (even at 550 C) furnace annealing. The formed junctions have been characterized for respective implantation conditions. In this experiment, the implant energy is the key role in obtaining a low leakage diode. Reverse current density of about 3 nA/cm{sup 2} and an ideality factor of about 1.05 can be attained by the implantation of BF{sub 2}{sup +} ions at 80 keV and subsequent annealing at 550 C. The junction depth is about 0.09 {mu}m, measured by the spread resistance method. As compared with the results of unimplanted specimens, the implantation of BF{sub 2}{sup +} ions into a thin Pd{sub 2}Si layer can stabilize the silicide film ...
1995-05-01
Energy Technology Data Exchange (ETDEWEB)
An attempt was made to minimize the channeling tail by implantation along a random equivalent direction following a careful alignment of the target. In order to analytically determine the random equivalent directions, critical angles for channeling were mapped on a stereogram. Boron ions with energies of 17 and 45 keV are implanted along specified directions determined from the map. The depth distribution of the dopant is profiled by SIMS and the effects of water orientation upon the channeling tail are noted. Industrial common use of a 7/sup 0/ tilt is not optimum. However, implantation with the wafer tilted at 5.5 +/- 0.5/sup 0/ from the surface normal and rotated at 7.0 +/- 0.5/sup 0/ from a (100) plane shows the least channel-tail compared to implantation along other directions. Rapid thermal annealing (RTA) is a promising annealing method for shallow junction formation. Transient enhanced diffusion ...
1985-01-01
International Nuclear Information System (INIS)
An attempt was made to minimize the channeling tail by implantation along a random equivalent direction following a careful alignment of the target. In order to analytically determine the random equivalent directions, critical angles for channeling were mapped on a stereogram. Boron ions with energies of 17 and 45 keV are implanted along specified directions determined from the map. The depth distribution of the dopant is profiled by SIMS and the effects of water orientation upon the channeling tail are noted. Industrial common use of a 7"0 tilt is not optimum. However, implantation with the wafer tilted at 5.5 +/- 0.5"0 from the surface normal and rotated at 7.0 +/- 0.5"0 from a (100) plane shows the least channel-tail compared to implantation along other directions. Rapid thermal annealing (RTA) is a promising annealing method for shallow junction formation. Transient enhanced diffusion of ...
Human bone matrix gelatin as a clinical alloimplant. A retrospective review of 160 cases.
Bone matrix gelatin, prepared by sequential chemical treatment including decalcification with 0.6 N hydrochloric acid [9], was used as an alloimplant for the treatment of benign bone tumours, tumorous conditions of bone, acetabular dysplasia, delayed union, traumatic bone defects and other disorders. The bone matrix gelatin implanted into bone defects was incorporated successfully in 98% of implantations, excluding cases of infection, tumour recurrence and recurrence of tumorous conditions. The material was also implanted into ten bone sites as an onlay but in five it was resorbed without new bone formation. The incorporation of the bone matrix gelatin into the recipient bed was completed from 6 to 33 months (average 14.9 months) after implantation. Wound infection complicated 5 of 165 implantations (3%) in previously uninfected sites. Low grade fever persisting after the tenth ...
1985-01-01
Electrical and structural properties of ion-implanted and post-annealed silicide films
Energy Technology Data Exchange (ETDEWEB)
The changes in the electrical and structural properties of metal-silicide films caused by ion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800/sup 0/C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi/sub 2/, NiSi/sub 2/ and Pd/sub 2/Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10/sup 16/ Ar-ions/cm/sup 2/, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd/sub 2/Si to ...
1982-05-01
Electrical and structural properties of ion-implanted and post-annealed silicide films
International Nuclear Information System (INIS)
The changes in the electrical and structural properties of metal-silicide films caused byion implantation and subsequent thermal annealing have been investigated. Epitaxial silicide films such as those of CoSi"2, NiSi"2 and Pd"2Si grown on Si(111) substrates were implanted with Ar ions and annealed in a vacuum furnace at temperatures ranging from 200 to 800_0C. Rutherford backscattering and channeling techniques and the four-point probe method were used to measure the crystalline quality and the sheet resistance of the films, respectively. It was found that the sheet resistances of CoSi"2, NiSi"2 and Pd"2Si films were increased by factors of 70, 6, and 3, respectively, by implantation to a dose of 1 x 10_1_6 Ar-ions/cm_2, but that they were almost restored by subsequent annealing to the values before implantation. A phase transformation from Pd"2Si to PdSi was also observed in the high-temperature ...
Energy Technology Data Exchange (ETDEWEB)
Accurate modeling of the enhanced diffusion of boron during rapid thermal annealing has been accomplished by incorporating the effects of extended defect formation and annealing on enhanced diffusion into a multizone, semiempirical model. The multizone model divides the implant profile into three zones defining regions of different defects and diffusion enhancements. The model also contains the initial enhanced diffusion and the transient diffusion effects associated with the dissolution of defect clusters and the annealing of extended defects, respectively. The saturation time for transient-enhanced diffusion contains an exponential function of implant dose in order to model the increase in point defect generated with higher implant dose. As a result, the model accurately simulates the boron diffusion profile over a wide range of implant doses and also shows the immobile boron peak of precipitated ...
1993-01-01
Defects induced by focused ion beam implantation in GaAs
Energy Technology Data Exchange (ETDEWEB)
The characteristics of defects induced by Si and Ga focused ion beam (FIB) implantation in n-GaAs have been investigated by means of deep-level transient spectroscopy (DLTS), C--V carrier profiling, and resistance measurements. The DLTS spectra of Si and Ga FIB implanted samples annealed at temperatures up to 500 /sup 0/C are apparently identical to one another and show three different electron traps with an activation energy between 0.25 and 0.6 eV. The resistance increases by more than five orders of magnitude by Si and Ga FIB implantation due to the induced defects. However, it is restored to initial values after annealing at 600 /sup 0/C, except for a sample of Ga implantation with a dose higher than 10/sup 14/ cm/sup 2/ . For annealing of induced defects, there are no intrinsic problems for FIB implantation with a dose lower than 10/sup 13/ cm/sup 2/ .
1988-05-01
Defects induced by focused ion beam implantation in GaAs
International Nuclear Information System (INIS)
The characteristics of defects induced by Si and Ga focused ion beam (FIB) implantation in n-GaAs have been investigated by means of deep-level transient spectroscopy (DLTS), C--V carrier profiling, and resistance measurements. The DLTS spectra of Si and Ga FIB implanted samples annealed at temperatures up to 500 "0C are apparently identical to one another and show three different electron traps with an activation energy between 0.25 and 0.6 eV. The resistance increases by more than five orders of magnitude by Si and Ga FIB implantation due to the induced defects. However, it is restored to initial values after annealing at 600 "0C, except for a sample of Ga implantation with a dose higher than 10"1"4 cm"2 . For annealing of induced defects, there are no intrinsic problems for FIB implantation with a dose lower than 10"1"3 cm"2.
Current trends in ion implantation
Energy Technology Data Exchange (ETDEWEB)
As semiconductor device dimensions continue to shrink, the drive beyond 250 nm is creating significant problems for the device processor. In particular, trends toward shallower-junctions, lower thermal budgets and simplified processing steps present severe challenges to ion implantation. In parallel with greater control of the implant process goes the need for a better understanding of the physical processes involved during implantation and subsequent activation annealing. For instance, the need for an understanding of dopant-defect interaction is paramount as defects mediate a number of technologically important phenomena such as transient enhanced diffusion and impurity gettering. This paper will outline the current trends in the ion implantation and some of the challenges it faces in the next decade, as described in the semiconductor roadmap. It will highlight some recent positron annihilation work ...
2001-07-01
Anomalous phosphorus diffusion in Si during postimplantation annealing
Energy Technology Data Exchange (ETDEWEB)
The transient behavior of P diffusion in Si implanted with As or Ge above the amorphizing threshold has been investigated. Annealing at 720{degree}C after Ge implantation induces extensive P segregation into the extended defect layer formed by implantation damage. This segregation is attributed to P trapping to end-of-range {l_brace}311{r_brace} defects and dislocation loops. For As implantation, P segregation was also observed only after 1 min annealing. However, in contrast to the Ge implantation, in the As-implanted samples, significant P depletion occurs in the As-tail region after further annealing. Nonequilibrium simulation that takes into account both Fermi-level and electric field effects shows the P depletion during transient enhanced diffusion. Furthermore, simulation results based on the coexistence of neutral and positively charged ...
2001-06-11
Annealing and diffusion characteristics of boron-through-oxide implanted silicon
Energy Technology Data Exchange (ETDEWEB)
The author investigates the diffusion and damage-annealing characteristics as a result of boron implantation through a surface oxide into the silicon, a process that is commonly realized in the fabrication of p-n junctions. Defect structures were examined using plan-view and cross-section transmission-electron microscopies. It is shown that recoil-implanted oxygen plays a critical role in determining the above annealing characteristics. For instance, transient-enhanced diffusion of boron, as is widely observed for boron-implanted silicon, does not occur in the case of through-oxide implantation. The initial suppression of the defect-enhanced diffusion lasts for a limited period of time after which enhanced diffusion occurs again. The so-called incubated enhanced diffusion' is characterized as due to recoiled-oxygen precipitation-emitting point defect that enhances boron motion. The incubation ...
1991-01-01
Annealing and diffusion characteristics of boron-through-oxide implanted silicon
International Nuclear Information System (INIS)
The author investigates the diffusion and damage-annealing characteristics as a result of boron implantation through a surface oxide into the silicon, a process that is commonly realized in the fabrication of p-n junctions. Defect structures were examined using plan-view and cross-section transmission-electron microscopies. It is shown that recoil-implanted oxygen plays a critical role in determining the above annealing characteristics. For instance, transient-enhanced diffusion of boron, as is widely observed for boron-implanted silicon, does not occur in the case of through-oxide implantation. The initial suppression of the defect-enhanced diffusion lasts for a limited period of time after which enhanced diffusion occurs again. The so-called incubated enhanced diffusion' is characterized as due to recoiled-oxygen precipitation-emitting point defect that enhances boron motion. The incubation time ...
A detailed physical model for ion implant induced damage in silicon
Energy Technology Data Exchange (ETDEWEB)
A unified physically based ion implantation damage model has been developed which successfully predicts both the impurity profiles and the damage profiles for a wide range of implant conditions for arsenic, phosphorus, BF{sub 2}, and boron implants into single-crystal silicon. In addition, the amorphous layer thicknesses predicted by this new damage model are also in excellent agreement with experimental measurements. This damage model is based on the physics of point defects in silicon, and explicitly simulates the defect production, diffusion, and their interactions which include interstitial-vacancy recombination, clustering of same type of defects, defect-impurity complex formation, emission of mobile defects from clusters, and surface effects for the first time. New computationally efficient algorithms have been developed to overcome the barrier of the excessive computational requirements. In addition, the new model ...
1998-06-01
A detailed physical model for ion implant induced damage in silicon
International Nuclear Information System (INIS)
A unified physically based ion implantation damage model has been developed which successfully predicts both the impurity profiles and the damage profiles for a wide range of implant conditions for arsenic, phosphorus, BF_2, and boron implants into single-crystal silicon. In addition, the amorphous layer thicknesses predicted by this new damage model are also in excellent agreement with experimental measurements. This damage model is based on the physics of point defects in silicon, and explicitly simulates the defect production, diffusion, and their interactions which include interstitial-vacancy recombination, clustering of same type of defects, defect-impurity complex formation, emission of mobile defects from clusters, and surface effects for the first time. New computationally efficient algorithms have been developed to overcome the barrier of the excessive computational requirements. In addition, the new model has ...
1998-06-01
Study of penetration depth for V"+ with low energy implanted in peanut seeds
International Nuclear Information System (INIS)
The penetration depth and concentration distribution for vanadium ions with low energy implanted into the dry peanut seeds is determined by scanning electron microscope and X-ray energy dispersion spectrometer. The results show that the depth-concentration distribution is a Gaussian distribution with a long tail and the maximum penetration depth is about 13.6 #mu#m for V"+ with 200 keV in cotyledon of the peanut. The experimental result of the implanted V"+ range in the peanut seeds is compared with the calculating value of the TRIM95
2002-11-01
Energy Technology Data Exchange (ETDEWEB)
Modified Ostwald ripening theory is used to calculate the time evolution of the size distribution function of extended end-of-range defects in ion implanted silicon. This allows the authors to compare the time dependent self-interstitial supersaturation during post-implantation annealing in the presence of Frank-type stacking faults with that in the presence of {l_brace}311{r_brace}-defects. It is shown that the latter affect self-interstitial concentrations up to the point where they dissolve whereas the former are irrelevant from the point of view of transient enhanced diffusion.
1996-12-01
Precipitation, phase transformation, and enhanced diffusion in ion-implanted silicon
International Nuclear Information System (INIS)
This paper describes Z-contrast scanning transmission electron microscopy used to study the connection between dopant precipitation and phase transformation in high dose In"+ and Sb"+ implanted Si. In the case of In, the observations confirm a heterogeneous nucleation model. Images of the precursor precipitates give the first measurement of the diffusion coefficient in amorphous Si, with an enhancement of 10"7 over tracer crystalline values. With Sb"+ implants enhanced homogeneous nucleation is observed. The connection between these results and the transient enhanced diffusion observed in crystallized Si is discussed.
Energy Technology Data Exchange (ETDEWEB)
The bibliography contains citations concerning plasma immersion ion implantation (PIII) and equipment. PIII is a new technique to implant plasma ions into materials for surface modification and treatment. Topics include plasma nitriding, semiconductor doping, ion energy distribution, ion dose, pulsed plasma, metal plasma, and defect passivation. References also review applications in semiconductor device and integrated circuit manufacture, silicon material fabrication, aerospace bearings, carbon coatings on metals, and ceramic coatings. (Contains 50-250 citations and includes a subject term index and title list.) (Copyright NERAC, Inc. 1995)
1998-01-01
Nanostructure of Si-Ge near-surface layers produced by ion implantation and laser annealing
International Nuclear Information System (INIS)
An annealing with the nanosecond laser light pulse is applied for crystal lattice reconstruction of a disturbed near-surface layer, which was created in semiconductor material as a result of the implantation process. Radiation with energy density higher than the threshold value causes the melting of the surface layer and than the epitaxial recrystallization from the melt on a different substrate. Structural changes occurring in the Ge implanted Si crystals after annealing with different energy densities are investigated by means of the cross-section high-resolution transmission electron microscopy. (author)
2001-09-23
Energy Technology Data Exchange (ETDEWEB)
It has been observed that dislocation loops form and grow during annealing of silicon wafers implanted at doses above the amorphization threshold. Dislocation loops can act to store interstitials for prolonged periods of anneals, sustaining an interstitial super-saturation and thus causing substantial transient enhanced diffusion (TED). The authors have developed a comprehensive model which, in combination with a model and parameters for {l_brace}311{r_brace} defects from previous work, accounts for the formation and evolution of dislocation loops during ion implant annealing, as well as giving the correct TED behavior.
1997-11-01
International Nuclear Information System (INIS)
It has been observed that dislocation loops form and grow during annealing of silicon wafers implanted at doses above the amorphization threshold. Dislocation loops can act to store interstitials for prolonged periods of anneals, sustaining an interstitial super-saturation and thus causing substantial transient enhanced diffusion (TED). The authors have developed a comprehensive model which, in combination with a model and parameters for #left brace#311#right brace# defects from previous work, accounts for the formation and evolution of dislocation loops during ion implant annealing, as well as giving the correct TED behavior.
1996-12-02
Application of high energy ion beam for the control of boron diffusion
Energy Technology Data Exchange (ETDEWEB)
For the purpose of optimizing the process of co-implantation of MeV Si ions to reduce boron transient enhanced diffusion and boron-enhanced diffusion in Si, multiple MeV implantations and annealing at different temperatures have been performed. A slight improvement on the suppression of B diffusion is observed by adding a low temperature annealing step after the MeV implantation. No differences in B diffusion are observed when the Si doses are increased from 1 x 10{sup 15} to 1 x 10{sup 16} cm{sup -2}. This dose independent behavior is speculated to be a quasi-steady state of vacancy cluster evaporation.
2006-01-15
Application of high energy ion beam for the control of boron diffusion
International Nuclear Information System (INIS)
For the purpose of optimizing the process of co-implantation of MeV Si ions to reduce boron transient enhanced diffusion and boron-enhanced diffusion in Si, multiple MeV implantations and annealing at different temperatures have been performed. A slight improvement on the suppression of B diffusion is observed by adding a low temperature annealing step after the MeV implantation. No differences in B diffusion are observed when the Si doses are increased from 1 x 10"1"5 to 1 x 10"1"6 cm"-"2. This dose independent behavior is speculated to be a quasi-steady state of vacancy cluster evaporation.
2006-01-01
A spatial damage energy distribution calculation for ion-implanted materials
International Nuclear Information System (INIS)
A simple method allowing easy calculation of the spatial damage energy distributions for ion-implanted materials is presented. The direct procedure takes account of the variation with depth of the lateral spreading of implanted ions, as well as the effects of energy transport by the recoiling target atoms. The subsequent computer program LUPIN-3D provides three-dimensional damage distributions and allows the construction of damage energy mappings. Various substrates of technological interest are investigated and several fields of application of the calculation are envisaged. The density of cascades can therefore be determined and heterogeneous amorphization models can be implemented. (orig.).
1989-01-01
Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.
1985-08-01
Transient-enhanced diffusion during furnace and rapid thermal annealing of ion-implanted silicon
International Nuclear Information System (INIS)
A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of ion-implanted silicon. We have studied this transient in detail and show that, for doses of Group V dopants sufficient to amorphize the silicon, it arises from the trapping of interstitials by dopant atoms during implantation. These are retained during solidphase-epitaxial (SPE) growth, but can be released by additional thermal processing to cause the observed transient and the formation of a band of extended defects. We have measured the enhanced diffusion coefficients and the duration of the transient for Sb-implanted Si by careful furnace annealing experiments. We obtain general expressions which predict the effects of the transient during any thermal processing based on SPE growth (furnace, CW laser, or rapid thermal annealing). We show that there is no analogous mechanism of vacancy trapping by Group III elements.
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
International Nuclear Information System (INIS)
We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As"+ implanted Si.
1984-11-26
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
Energy Technology Data Exchange (ETDEWEB)
The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As/sup +/ implanted Si. 12 references, 12 figures.
1986-01-01
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
Energy Technology Data Exchange (ETDEWEB)
We have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. We show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase-epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. We discuss the conditions under which the various effects may or may not be observed, and discuss conflicting observations on As/sup +/ implanted Si.
1984-01-01
Transient enhanced diffusion and gettering of dopants in ion implanted silicon
International Nuclear Information System (INIS)
The authors have studied in detail the transient enhanced diffusion observed during furnace or rapid-thermal-annealing of ion-implanted Si. The authors show that the effect originates in the trapping of Si atoms by dopant atoms during implantation, which are retained during solid-phase epitaxial (SPE) growth but released by subsequent annealing to cause a transient dopant precipitation or profile broadening. The interstitials condense to form a band of dislocation loops located at the peak of the dopant profile, which may be distinct from the band formed at the original amorphous/crystalline interface. The band can develop into a network and effectively getter the dopant. They discuss the conditions under which the various effects may or may not be observed, and discuss preliminary observations on As"+ implanted Si. 12 references, 12 figures.
The effect of ion implantation of Ar on the aqueous corrosion resistance of Zr-4 alloy
International Nuclear Information System (INIS)
The effect of ion implantation on the aqueous corrosion resistance of Zr-4 in deaerated 1N H_2SO_4 was studied with the potentiokinetic technique. The Zr-4 alloy was bombarded with 5x10"1"4-2x10"1"6 Ar/cm"2 of 190 keV. It was found that the passive current density of Zr-4 decreases with increasing implantation dose. Photoelectrochemical results show that the ion implantation of Ar in Zr-4 raises the flatband potential of its passive film. AES was employed to analyze the surface of the passive film of Zr-4. The decrease in passive current density may be attributed to a thickening oxide layer on Zr-4 and a decrease in concentration of oxygen vacancies in its passive film. ((orig.)).
Surgeons' beliefs and perceptions about removal of orthopaedic implants
UK PubMed Central (United Kingdom)
BackgroundThe routine removal of orthopaedic fixation devices after fracture healing remains an issue of debate. There are no evidence-based guidelines on this matter, and little...Full Text Available
Energy Technology Data Exchange (ETDEWEB)
The effect of {ital in} {ital situ} photoexcitation during boron ion implantation on subsequent transient enhanced B diffusion in Si has been investigated. Photoexcitation using a mercury arc lamp was performed during B{sup +} implantation at 35 keV for a dose of 5{times}10{sup 14} cm{sup {minus}2} at 177 K. A reduction in the electrical activation dip, i.e., reverse annealing effect, in the temperature range 550--700 {degree}C was observed. Also, the transient enhanced diffusion of B, measured using SIMS following 800 {degree}C, 30 min annealing, was suppressed. Both effects demonstrate that the creation of self-interstitials during the implantation process is significantly reduced. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.
1995-10-09
International Nuclear Information System (INIS)
The effect of in situ photoexcitation during boron ion implantation on subsequent transient enhanced B diffusion in Si has been investigated. Photoexcitation using a mercury arc lamp was performed during B"+ implantation at 35 keV for a dose of 5x10"1"4 cm"-"2 at 177 K. A reduction in the electrical activation dip, i.e., reverse annealing effect, in the temperature range 550--700 degree C was observed. Also, the transient enhanced diffusion of B, measured using SIMS following 800 degree C, 30 min annealing, was suppressed. Both effects demonstrate that the creation of self-interstitials during the implantation process is significantly reduced. copyright 1995 American Institute of Physics.
Energy Technology Data Exchange (ETDEWEB)
A specific radiochemical procedure for indium determination in semiconductor-grade silicon, using an inorganic ion exchanger (cerium oxalate) is proposed.
1982-12-23
Role of MeV ion implantation in limiting transient enhanced diffusion of boron atoms in silicon
International Nuclear Information System (INIS)
English Jul 2001 p. 143-144 China Liu Changlong Academia Sinica,
2001-07-01
International Nuclear Information System (INIS)
In this paper a novel method is presented, based on the use of plasma processing, to suppress the transient enhanced diffusion of boron implanted in silicon. We found for silicon samples processed with plasma and subsequently boron implanted that the anomalous diffusion of the dopant atoms at the beginning of the annealing process is almost completely suppressed. This phenomenon is interpreted in terms of capture of the ion beam generated interstitials by the dislocations induced by the plasma processing. At room temperature the dislocations are observed to grow in size after the boron implant, attesting their efficiency as trapping centres for interstitials. Moreover, varying the plasma process conditions we can establish a general relation between the presence of the trapping centres induced by the plasma processing and the suppression of the transient diffusion.
1999-01-01
Optical and Structural Characteristics of Heavily Boron ...
... Abstract : Cadmium telluride single crystals were subjected to multiple-energy boron ion implants with total doses up to 1.5 x 10 sq cm. ...
1988-05-24
NASA partners with teacher institute NASA strives to improve computers
of the digital hearing aid technology that led to the cochlear implant. Former. Marshall Space Flight Center engineers. John Richardson and Joseph Howard ...
International Nuclear Information System (INIS)
As to all sinter variations the microradiographic analysis showed that about 86 to 90 % of the implant surface were enclosed split-free with newly formed bone 16 weeks post operationem. A silicat salt addition of the test variation Ap_4_0KS_1_5 and Ap_4_0KS_3_0 did not cause a negative influence on bone regeneration. On the surface of all test implants a double layer was revealed radiologically, consisting of a 30 - 40 #mu#m thick bone near X-ray impermeable area and an X-ray permeable area of maximum 120 #mu#m thickness directed to the nucleus of the implant.
Energy Technology Data Exchange (ETDEWEB)
As to all sinter variations the microradiographic analysis showed that about 86 to 90 % of the implant surface were enclosed split-free with newly formed bone 16 weeks post operation. A silicate salt addition of the test variation Ap/sub 40/KS/sub 15/ and Ap/sub 40/KS/sub 30/ did not cause a negative influence on bone regeneration. On the surface of all test implants a double layer was revealed radiologically, consisting of a 30 - 40 ..mu..m thick bone near X-ray impermeable area and an X-ray permeable area of maximum 120 ..mu..m thickness directed to the nucleus of the implant.
1984-01-01
British Library Electronic Table of Contents (United Kingdom)
Placement of dental implants in the interforaminal region of the edentulous mandible is considered a safe and routine surgical procedure. Hemorrhage in the floor of the mouth has been reported as a rare, potentially life-threatening complication related to the placement of implants in this region. In this case report the authors present an immediate and a delayed case of massive bleeding in the floor of the mouth after implant placement. This highly vascularized region is vulnerable and bleeding can be induced easily by instrumentation, causing a vascular trauma, usually by perforation of lingual periostium. In almost all cases the expanding hematoma formation starts during surgery. The effect of the vasoconstrictive agent in the local anesthesic combined with an injury of the lingual arte...
2010-01-01
Enhancement of electrical conductivity of ion-implanted polymer films
Energy Technology Data Exchange (ETDEWEB)
The electrical conductivity of ion-implanted films of Nylon 66, Polypropylene (PP), Poly(tetrafluoroethylene) (Teflon) and mainly Poly (ethylene terephthalate) (PET) was determined by DC measurements at voltages up to 4500 V and compared with the corresponding values of pristine films. Measurements were made at 21/sup 0/C +/- 1/sup 0/C and 65 +/- 2% RH. The electrical conductivity of PET films implanted with F/sup +/, Ar/sup +/, or As/sup +/ ions at energies of 50 keV increases by seven orders of magnitude as the fluence increases from 1 x 10/sup 18/ to 1 x 10/sup 20/ ions/m/sup 2/. The conductivity of films implanted with As/sup +/ was approximately one order greater than those implanted with Ar/sup +/, which in turn was approximately one-half order greater than those implanted with F/sup +/. The conductivity of the most conductive film approx.1 S/m) was almost 14 orders of ...
1985-01-01
Diffusion of antimony in silicon in the presence of point defects
Energy Technology Data Exchange (ETDEWEB)
We have investigated the diffusion of Sb in Si in the presence of defects injected by high-energy implantation of Si ions at room temperature. MeV ion implantation increases the concentrations of vacancies, which induce transient-enhanced diffusion of Sb deposited in Si. We observed a significant enhancement of Sb diffusion. Secondary ions mass spectroscopy has been performed on the implanted samples before and after annealing. Rutherford-backscattering spectrometry has been used to characterize the high-energy implantation damage. By fitting diffusion profiles to a linear diffusive model, information about atomic scale diffusion of Sb, i.e. the generation rate of mobile state Sb and its mean migration length were extracted.
2007-08-15
Diffusion of antimony in silicon in the presence of point defects
International Nuclear Information System (INIS)
We have investigated the diffusion of Sb in Si in the presence of defects injected by high-energy implantation of Si ions at room temperature. MeV ion implantation increases the concentrations of vacancies, which induce transient-enhanced diffusion of Sb deposited in Si. We observed a significant enhancement of Sb diffusion. Secondary ions mass spectroscopy has been performed on the implanted samples before and after annealing. Rutherford-backscattering spectrometry has been used to characterize the high-energy implantation damage. By fitting diffusion profiles to a linear diffusive model, information about atomic scale diffusion of Sb, i.e. the generation rate of mobile state Sb and its mean migration length were extracted.
2007-08-01
International Nuclear Information System (INIS)
Nuclear Reaction Analysis (NRA) with deuteron ion beams has been used to probe for ion implanted nitrogen and carbon with high sensitivity in zinc oxide and silicon single crystals. The ion implanted N was measured using 1.4 MeV deuteron ion beams and was found to be in agreement with calculated values. The limit of detection for N in ZnO is 8x1014 ions cm-2. Raman measurements of the ion implanted samples showed three additional modes at 275, 504, and 644 cm-1 compared to the un-implanted ZnO crystals. The NRA and Raman results provided information on the N concentration, depth distribution, and structural changes that occur in dependence on the nitrogen ion fluences. The deuterium induced 12C(d,p)13C reaction was used to measure the carbon impurity/dose in ion implanted silicon. It was found that the use of a large cold shield (liquid nitrogen trap) in the ion ...
2008-11-03
Crystal Chemistry of Ceramic/Mineral Systems
... 1. Reeber, RR, Kusy, RP, Yu, N. and Chu, WK " Formation of a Solid Lubricant in Boron Carbide by Nitrogen Ion Implantation and Laser Annealing ...
1992-12-08
Creation of nitrogen-vacancy centres in diamond with high resolution
International Nuclear Information System (INIS)
Nowadays, diamond and the nitrogen-vacancy (NV) colour centres constitute the best solid-state system in view of quantum-computing applications. It has also been shown recently that single NV centres could be used as nanoscale magnetic sensors. Such applications require the creation of single NV centres with very high resolution and with a high efficiency. The nano-implanter at the university of Bochum provides low energy nitrogen ions which can be implanted through a hole pierced in the tip of an atomic force microscope. Ultrapure diamond samples have been implanted with spot sizes of 50nm and less. Stimulated Emission Depletion (STED) microscopy has been used to characterise and resolve the implanted spots.
2010-03-21
Boron-enhanced-diffusion of boron: The limiting factor for ultra-shallow junctions
Energy Technology Data Exchange (ETDEWEB)
Reducing implant energy is an effective way to eliminate transient enhanced diffusion (TED) due to excess interstitials from the implant. It is shown that TED from a fixed Si dose implanted at energies from 0.5 to 20 keV into boron doping-superlattices decreases linearly with decreasing Si ion range, virtually disappearing at sub-keV energies. However, for sub-keV B implants diffusion remains enhanced and x{sub j} is limited to {ge} 100 nm at 1,050 C. The authors term this enhancement, which arises in the presence of B atomic concentrations at the surface of {approx} 6%, Boron-Enhanced-Diffusion (BED).
1997-12-01
International Nuclear Information System (INIS)
Ion implantation is used at several critical stages of Si integrated circuit manufacturing. The authors show how #left brace#311#right brace# defects arising after implantation are responsible for both enhanced dopant diffusion during annealing, and stable dislocations post-anneal. They observe #left brace#311#right brace# defects in the earliest stages of an anneal. They subsequently undergo rapid Ostwald ripening and evaporation. At low implant doses evaporation dominates, and they can quantitatively relate the interstitials emitted from these defects to the transient enhancement in diffusivity of dopants such as B and P. At higher doses Ostwald ripening is significant, and they observe the defects to undergo a series of unfaulting reactions to form both Frank loops and perfect dislocations. They demonstrate the ability to control both diffusion and dislocations by the addition of small amounts of carbon impurities.
1995-03-20
Study of silicon damage caused by ultra-low energy boron implantation
International Nuclear Information System (INIS)
Ultra-shallow junction formation in deep submicron Si devices is limited by anomalous diffusion of the dopant, which is related to the release of interstitials from defect clusters formed during the implantation of energetic ions or the subsequent annealing. The work described in this dissertation is concerned with the effects of low energy B ion implantation, especially damage formation, clustering and its annealing. After a review of the stopping and ranges of energetic ions in Si, the formation of implant damage, in particular of point defects, their migration, agglomeration and annihilation, including the involvement of dopant ions, is considered. A description of the Salford ultra low energy implanter is given and the main analysis technique, medium ion energy scattering (MEIS) reviewed. Additional analytical techniques used, such as secondary ion mass spectrometry (SIMS), 4-point probe and cross ...
Energy Technology Data Exchange (ETDEWEB)
The lateral bearing device is made of 7 lateral supports, each positioned to allow the displacement of the steam generator due to thermal or seismic effects. Each support includes a buffer plate that can be positioned on the steam generator using a position control assembly. This control assembly consists of a screw jack arrangement where the nut is fastened via an energy absorbing layer to a footplate that is fixed to the concrete wall of the steam generator enclosure. 4 figs.
1993-10-01
British Library Electronic Table of Contents (United Kingdom)
In this study, the shear viscosities of wood?plastic composites (WPC)/supercritical CO2 (sc-CO2) solutions at different die temperatures and sc-CO2 contents were measured by a slit die attached on a single-screw extrusion system. A theoretical model based on the Carreau-Yasuda model and Arrhenius equation was then developed to describe the shear-thinning behavior of the WPC/sc-CO2 solution. This model was incorporated into a finite element method software, POLYFLOW, to simulate the pressure and velocity field of WPC/sc-CO2 solution flowing through a foaming die. Based on the simulation results, the pressure drop rate and the location of the supersaturation point were estimated to investigate the cell nucleation. The saturation pressure of sc-CO2 in WPC was determined by a magnetic suspensi...
2011-01-01
Sheathed cold-formed steel housing: A seismic design procedure
British Library Electronic Table of Contents (United Kingdom)
Nowadays, different research teams are engaged on experimental and theoretical studies having as main aim the evaluation of seismic performance of sheathed cold-formed steel frame structures. Although a relatively large number of experimental and theoretical studies are available, the development of useful tools for the seismic design should be improved. As an attempt to overcome this lack, this paper aims to present a structural design procedure that allows, through the definition of three design nomographs, the screw spacing and all the shear walls components to be obtained on the basis of linear dynamic or nonlinear static seismic analysis. In addition, a procedure for the prediction of the whole pushover response curve of sheathed cold-formed steel shear walls, which can be advantageou...
2009-01-01
British Library Electronic Table of Contents (United Kingdom)
Several compatibilising systems were added to high-density polyethylene (HDPE) and polyamide 6 (PA6) blends in the presence of an organically modified montmorillonite (OMM). All the blends were prepared by using a co-rotating twin-screw extruder and characterized by SEM, TEM and XRD analyses. In addition, the rheological behaviour and the mechanical properties - tensile and impact - were evaluated. The presence of OMM affects the dimensions of the polymeric phases in the blend but not their mutual adhesion, granted only by the compatibilisers. TEM, SEM and XRD analyses indicated that there is a strict correlation between the compatibilisation level and the final interlayer distance achieved by OMM. Even if some filled compatibilised blends showed a fairly good morphology - in terms of phas...
2010-01-01
British Library Electronic Table of Contents (United Kingdom)
This work deals with a new route to modify polymer blend morphology in order to improve the porosity of gas diffusion layers (GDLs) for proton exchange membrane fuel cells (PEMFCs). First, electrically conductive polymer-based blends were carefully formulated using a twin-screw extrusion process. Blend electrical conductivity was ensured by the addition of high specific surface area carbon black and synthetic graphite flakes. Final GDL porosity, in particular its macroporosity, was generated by melt blending polyamide 11 (PA11) matrix with polystyrene (PS) followed by PS extraction with tetrahydrofuran (THF) solvent at room temperature. In order to improve GDL porosity by the optimisation of PS dispersion in the PA11 matrix, PA11/PS blends were compatibilised by the addition of 2 wt.-% of ...
2007-01-01
British Library Electronic Table of Contents (United Kingdom)
Abstract Preparation of antibacterial alginate films incorporating extruded white ginseng (EWG) extracts was attempted. The antibacterial effect of EWG extract on six selected food pathogenic bacteria was compared with the effect of red ginseng (RG) and white ginseng (WG) extracts. The EWG was processed in a twin-screw extruder with feed moisture of 20% and barrel temperature of 115 and 130C. The data obtained by agar diffusion assay demonstrated that the film containing 1-g/mL of EWG at barrel temperatures of 115 (EWG-115) and 130C (EWG-130) exhibited stronger antibacterial activity against the four strains of bacteria than the other extracts RG and WG. All films sampled showed reduction in bacteria cell counts (log cycle) compared with the control. After 24-h of incubation, Pseudomonas a...
2011-01-01
British Library Electronic Table of Contents (United Kingdom)
The treatment of acetabular bone defects presents a great challenge in revision total hip arthroplasty (THA). The purpose of this study was to evaluate the clinical and radiological outcome of revision THA using jumbo cups for acetabular reconstruction after applying the bone-grafting technique. We studied 17?patients with acetabular defects ranging from Type 2A to Type 3A according to Paprosky`s classification. According to the AAOS-score twelve patients were classified as Type II and five patients as Type III. Uncemented press-fit cups with an outer diameter larger than 64?mm were used in all cases. Fifteen patients received morselized bone allografts. In eight patients an additional screw fixation was necessary. The mean follow-up period was 82?months (range 33?149). The mean Harris Hip...
2008-01-01
British Library Electronic Table of Contents (United Kingdom)
Purpose The aim of this study was to evaluate the role of host periosteum and recipient bed perforation on the healing of an onlay graft to the mandible based on histologic and immunohistochemical analysis. Materials and methods Each of the 12 adult sheep used in the study received four iliac corticocancellous onlay bone grafts on the lateral surface of the mandible. In experiment 1, the block graft was placed in direct contact with the recipient bed and fixed with micro-screws, and in experiment 2, the recipient cortical bed was perforated before graft placement. The host periosteum around the graft was excised before flap replacement in experiment 3, and in experiment 4, a sheet of silicone membrane was placed between the graft and the recipient bed. The animals were euthanised at 4, 8, ...
2008-01-01
Extrusion as a thermo-mechanical pre-treatment for lignocellulosic ethanol
British Library Electronic Table of Contents (United Kingdom)
Two physical pre-treatment methods, particle size reduction by grinding and thermo-mechanical extrusion, were evaluated as alternatives to traditional biomass pretreatments for lignocellulosic ethanol. Commonly available agricultural co-products wheat bran and soybean hull were the model substrates. Extrusion led to higher reducing sugar yields as compared to grinding for wheat bran, but not in the case of soybean hulls. The best combination of extrusion screw speed and maximum barrel temperature were 7 Hz/150 ?C and 3.7 Hz/110 ?C. The use of a solvent mixture (sodium hydroxide, urea, and thiourea) and calcium chloride solution in combination with extrusion treatment did not lead to improvement in reducing sugar yield. However, extensive washing to get rid of solvents and enzymatic inhibit...
2010-01-01
Effect of thermal-treatment of wood fibres on properties of flat-pressed wood plastic composites
British Library Electronic Table of Contents (United Kingdom)
This study aimed to enhance the dimensional stability of flat-pressed wood plastic composites (WPCs) containing fast growing wood fibres by a thermal-treatment method. The wood fibres were treated at three different temperatures (120, 150, or 180 degreeC) for 20 or 40 min in a laboratory autoclave. The WPC panels were made from dry-blended Eucalyptus camaldulensis wood fibres and polypropylene (PP) powder (50:50 by weight) using a conventional flat-press process under laboratory conditions. Thickness swelling and water absorption of the WPC panels significantly decreased with increasing the treatment temperature and time. The thermal-treatment of eucalyptus wood fibres slightly decreased the screw withdrawal resistance of the WPC panels as compared to the reference panels while the flexura...
2011-01-01
Coordinated control of multiple manipulator systems
Energy Technology Data Exchange (ETDEWEB)
A scheme for controlling multimanipulator systems is presented. The control objective is to coordinate the manipulators to perform parts-matching tasks such as screwing a nut onto a bolt. The task of moving a rigid object can be treated as a special case. Two secondary control objectives internal force control and load distribution can be accomplished within the structure of the control law. The internal force control mechanism keeps the internal forces on the object being manipulated at a desirable level. The load distribution mechanism distributes control effort to each manipulator according to a weighting factor. It is also shown that the control algorithm has a modular structure which facilitates its implementation on a multiprocessor computer. The scheme was tested on a planar scara type dual-manipulator system. A series of experimental results is included to demonstrate the system performance under various conditions.
1993-08-01
Chicken runs provide the fuel for Fibrowatt's global ambitions
Energy Technology Data Exchange (ETDEWEB)
This article reports on the operation of Fibrowatt's third chicken waste-fuelled power plant at Thetford in Norfolk, UK. Details are given of the plant which started operation in October 1998, the chicken litter fuel, the spiral screw fuel feeders, the Detroit Stoker grate and spreader stokers which ensure the fuel is burnt mid-air, the production of fertiliser from the ash, and fluegas emission control using cyclones, a baghouse and lime addition to neutralise acid gas. The economics of the project, and the support for the renewable electricity generation under the UK government's Non-Fossil Fuel Obligation are discussed. A site plan of the Thetford plant and a flow diagram of the process are provided.
2000-08-01
Transient enhanced diffusion from decaborane molecular ion implantation
Energy Technology Data Exchange (ETDEWEB)
Transient enhanced diffusion (TED) from implantation of 5thinspkeVthinspB{sub 10}H{sub 14} and 0.5 keV B ions has been quantified and compared for nominal boron doses of 10{sup 14} and 10{sup 15}thinspcm{sup {minus}2}. Boron diffusivity during annealing was extracted from secondary ion mass spectroscopy depth profiles of diffused marker layers in boron doping-superlattices and the actual implanted B dose was independently measured by nuclear reaction analysis. Comparable enhancements were observed from both ions. Transmission electron microscopy analysis revealed that both boron- and decaborane-implanted samples were amorphized at a nominal 10{sup 15}thinspcm{sup {minus}2}thinspB dose. A comparison with data from low energy Si implants revealed a similar dependence of diffusivity enhancement on implant dose. These findings are consistent with the understanding that TED is caused by ...
1998-10-01
Transient enhanced diffusion from decaborane molecular ion implantation
International Nuclear Information System (INIS)
Transient enhanced diffusion (TED) from implantation of 5keVB_1_0H_1_4 and 0.5 keV B ions has been quantified and compared for nominal boron doses of 10"1"4 and 10"1"5cm"-"2. Boron diffusivity during annealing was extracted from secondary ion mass spectroscopy depth profiles of diffused marker layers in boron doping-superlattices and the actual implanted B dose was independently measured by nuclear reaction analysis. Comparable enhancements were observed from both ions. Transmission electron microscopy analysis revealed that both boron- and decaborane-implanted samples were amorphized at a nominal 10"1"5cm"-"2B dose. A comparison with data from low energy Si implants revealed a similar dependence of diffusivity enhancement on implant dose. These findings are consistent with the understanding that TED is caused by the interstitial supersaturation resulting from a number of excess ...
1998-10-01
Transient enhanced diffusion and deactivation of ion-implanted As in strained Si
International Nuclear Information System (INIS)
First results on the effects of strain on transient enhanced diffusion and deactivation of As-implanted ultrashallow junctions are presented. A significant effect of strain on the magnitude and timescale of transient enhanced diffusion is observed, which is consistent with the stabilization of interstitial-type defects by tensile strain. Our results show no significant impact of strain on As electrical activity during the deactivation timescale accessed in this study.
2005-08-01
UK PubMed Central (United Kingdom)
Background and ObjectivesClopidogrel resistance or low-responsiveness may be associated with recurrent atherothrombotic events after drug-eluting stent (DES) implantation. We prospectively...Full Text Available
2009-12-01
International Nuclear Information System (INIS)
The model of transient enhanced diffusion of ion-implanted As is formulated and the finite-difference method for numerical solution of the system of equations obtained is developed. The nonuniform distribution of point defects near the interface and more accurate description of arsenic clustering are simultaneously taken into account. Simulation of As diffusion during rapid annealing gives a reasonable agreement with the experimental data. (authors)
2005-09-01
Energy Technology Data Exchange (ETDEWEB)
Brachytherapy consists of sealed radioactive source implantation. The diversity in the nature of radioelements, in their energy and activity requires strict implantation and utilization rules. These rules include radioactive source physical parameters check, after-loading machine and treatment planning system quality assurance and safe and reproducible dosimetric systems. Patient and medical workers information guarantee radioprotection and prevention of accidental exposures. (authors)
2002-11-01
Pitting and intergranular corrosion resistances of nitrogen ion implanted type 304 stainless steel
International Nuclear Information System (INIS)
Type 304 stainless steel (SS) specimens sensitised at 873 K and 973 K for 1, 10 and 100 hours respectively were ion implanted using a 150 keV accelerator at an energy of 70 keV in two different doses of nitrogen namely 1 x 10"1"6 to 1 x 10"1"7 ions/cm"2. Ion implantation at 1 x 10"1"6 ions/cm"2 did not show any improvement in pitting resistance, however, the specimens implanted at 1 x 10"1"7 ions/cm"2 showed significant increase in pitting corrosion resistance when potentiodynamic anodic polarisation studies were carried out in acidic chloride medium. For specimens aged at 873 K, nitrogen ion implantation at 1 x 10"1"6 ions/cm"2 increased the intergranular corrosion susceptibility compared to that of unimplanted specimens. However, at the dose of 1 x 10"1"7 ions/cm"2, insignificant IGC attack was noticed. The IGC resistance increased with increase in the dose for all the specimens aged at 973 K, and the ...
1998-05-24
UK PubMed Central (United Kingdom)
Purpose:To study the outcome of in-the-bag implanted square-edge polymethyl methacrylate (PMMA) intraocular lenses (IOL) with and without primary posterior capsulotomy in...Full Text Available
2011-09-01
Optical image storage in ion implanted PLZT ceramics
International Nuclear Information System (INIS)
We have demonstrated that optical images can be stored in transparent lead-lanthanum-zirconate-titanate (PLZT) ceramics by exposure to near-UV light with photon energies greater than the band gap energy of approx. equal to 3.35 eV. The image storage process relies on optically induced changes in the switching properties of ferroelectric domains (photoferroelectric effect). Stored images are nonvolatile but can be erased by uniform UV illumination and simultaneous application of an electric field. Although high quality images, with contrast variations of >= 100:1 and spatial resolution of approx. equal to 10 #mu#m, can be stored using the photoferroelectric effect, relatively high exposure energies (approx. equal to 100 mJ/cm"2) are required to store these images. This large exposure energy severely limits the range of possible applications of nonvolatile image storage in PLZT ceramics. We have recently found from studies of H, He and Ar implanted PLZT that the ...
Introduction to corrosion of bioimplants
British Library Electronic Table of Contents (United Kingdom)
The review provides a general idea about the types of metallic alloys and the pure metals used as implant materials in dental and orthopedic surgery. Their corrosive behavior in both real solutions and various media that model human biological fluids is described. Based on the literature data, it is concluded that multicomponent alloys containing titanium, niobium, zirconium, tungsten, molybdenum, aluminum, and silicon are the most resistant to corrosion. Implants made of different types of stainless steel are preferred when manufacturing orthopedic devices for short-term use.
2011-01-01
Boron uphill diffusion during ultrashallow junction formation
International Nuclear Information System (INIS)
The recently observed phenomenon of boron uphill diffusion during low-temperature annealing of ultrashallow ion-implanted junctions in silicon has been investigated. It is shown that the effect is enhanced by preamorphization, and that an increase in the depth of the preamorphized layer reduces uphill diffusion in the high-concentration portion of boron profile, while increasing transient enhanced diffusion in the tail. The data demonstrate that the magnitude of the uphill diffusion effect is determined by the proximity of boron and implant damage to the silicon surface.
2003-05-26
A study of palladium silicide formed by focused ion beam implantation of palladium ions
The formation and properties of Pd{sub 2}Si formed by focused ion beam implantation of Pd ions into Si is presented in this thesis. An extensive microstructural study using transmission electron microscopy was undertaken and the as-implanted as well as annealed microstructure is shown. Results of other analysis techniques such as Rutherford back scattering and secondary ion mass spectrometry etc. are also presented. Kinetic information on the growth of Pd{sub 2}Si obtained by both microstructural and resistance measurements indicates that the activation energy for growth of the silicide is around 0.36 to 0.39 eV. This can be compared with the normally reported value of 1.5 eV for Pd{sub 2}Si formed by annealing thin film Pd on Si. The growth of the silicide was found to follow t{sup 1/2} kinetics. Microstructural observation of the as-implanted samples showed extensive in-situ formation of Pd{sub 2}Di and also surprisingly ...
1989-01-01
A study of palladium silicide formed by focused ion beam implantation of palladium ions
International Nuclear Information System (INIS)
The formation and properties of Pd_2Si formed by focused ion beam implantation of Pd ions into Si is presented in this thesis. An extensive microstructural study using transmission electron microscopy was undertaken and the as-implanted as well as annealed microstructure is shown. Results of other analysis techniques such as Rutherford back scattering and secondary ion mass spectrometry etc. are also presented. Kinetic information on the growth of Pd_2Si obtained by both microstructural and resistance measurements indicates that the activation energy for growth of the silicide is around 0.36 to 0.39 eV. This can be compared with the normally reported value of 1.5 eV for Pd_2Si formed by annealing thin film Pd on Si. The growth of the silicide was found to follow t"1"/"2 kinetics. Microstructural observation of the as-implanted samples showed extensive in-situ formation of Pd_2Di and also surprisingly few defect structures. ...
International Nuclear Information System (INIS)
Decaborane (B_1_0H_1_4) cluster ions were implanted into n-Si(100) substrates to fabricate shallow p"+/n junctions. Implant energies of 2 keV, 5 keV, and 20 keV, equivalent to implant energies of the monomer boron ion of 174 eV, 435 eV, and 1.74 keV, respectively, were used at dosages of 1 X 10"1"2 /cm"2 and 1 X 10"1"3 /cm"2. The implanted samples were then subjected to activation annealing at 800 .deg. C, 900 .deg. C, and 1000 .deg. C for 10 s. By using secondary ion mass spectrometry (SIMS) depth profiles, we determined that the depth of the shallow junction (D_s) at a dosage of 1 X 10"1"3 /cm"2 was in the range 12 nm - 45 nm after annealing at 1000 .deg. C. D_s and transient enhanced diffusion (TED) were greatly reduced at implant energies lower than 5 keV, but thermal diffusion (TD) smoothly decreased. In particular, TED was suppressed in the p"+/n junction ...
2004-06-01
British Library Electronic Table of Contents (United Kingdom)
Abstract A method to grow the halophilic archaeon Haloferax volcanii in microtiter plates has been optimized and now allows the parallel generation of very reproducible growth curves. The doubling time in a synthetic medium with glucose is around 6-h. The method was used to optimize glucose and casamino acid concentrations, to clarify carbon source usage and to analyze vitamin dependence. The characterization of osmotolerance revealed that after a lag phase of 24-h, H. volcanii is able to grow at salt concentrations as low as 0.7-M NaCl, much lower than the 1.4-M NaCl described as the lowest concentration until now. The application of oxidative stresses showed that H. volcanii exhibits a reaction to paraquat that is delayed by about 10-h. Surprisingly, only one of two amino acid auxotrophi...
2011-01-01
Ocean teleconnections between Antarctica and the Equatorial Pacific and Atlantic.
Environmental Research Database
Objectives(i) Investigate the correlation between Antarctic sea-ice and equatorial sea-surface temperature anomalies in a realistically forced ocean model simulation of the last 50 years. (ii) Determine whether and how the enormous seasonal change in distribution of sea-ice modifies the seasonal cycle at the Equator. (iii) Determine the detailed pathways of wave propagation both in a historically-forced simulation and in response to realistic perturbations. (iv) Quantify the amplitude of the response i [continued...]DescriptionIt is well known that the equatorial ocean-atmosphere system plays a key role in global climate events such as the El Nino-Southern Oscillation (ENSO) phenomenon. There is now compelling evidence that changes in the Antarctic can strongly and quickly affect the equatorial ocean and the ENSO cycle. Observations demonstrate statistically significant correlations (teleconnections) between the Antarctic and the Equator with leads and lags of ...
2009-01-31
Mother and infant coordinate heart rhythms through episodes of interaction synchrony
British Library Electronic Table of Contents (United Kingdom)
Animal studies demonstrated the powerful impact of maternal-infant social contact on the infant's physiological systems, yet the online effects of social interactions on the human infant's physiology remain poorly understood. Mothers and their 3-month old infants were observed during face-to-face interactions while cardiac output was collected from mother and child. Micro-analysis of the partners' behavior marked episodes of gaze, affect, and vocal synchrony. Time-series analysis showed that mother and infant coordinate heart rhythms within lags of less than 1s. Bootstrapping analysis indicated that the concordance between maternal and infant biological rhythms increased significantly during episodes of affect and vocal synchrony compared to non-synchronous moments. Humans, like other mamm...
2011-01-01
British Library Electronic Table of Contents (United Kingdom)
In an environment of rapid technological change, countries in the developed and developing worlds need to improve the population's skills and competences. Since 1992, education reforms and various education sector documents and policy frameworks have been implemented to improve quality of education by getting more children into school through the abolishing of school fees, and the school feeding programme, whilst special efforts are made to deal with issues of gender inequality and the empowerment of women to meet the goals of Education for All and the education-related Millennium Development Goals 2 and 3. Though gains have been made in the area of gross enrolment ratio, there are still gross disparities in net enrolment and completion rates at regional level, with girls lagging behind bo...
2011-01-01
Energy Technology Data Exchange (ETDEWEB)
At the 7th Healthy Buildings Conference, which was held in Singapore, 7-11 December 2003, more than 500 articles to improve public health and productivity of workers in buildings and the performance of installations. Special attention is paid to indoor air quality and thermal comfort in relation to energy efficiency. [Dutch] Op de laatste Healthy Buildings conferentie, december 2003 in Singapore, werden meer dan 500 artikelen gepresenteerd over het creeren van gezonde, productiviteit verhogende gebouwen en installaties. Deze keer lag de nadruk op binnenluchtkwaliteit en thermisch binnenklimaat, onder andere op het aspect energiezuinigheid. Opvallend was ook de aandacht die de problemen met binnenluchtkwaliteit in ontwikkelingslanden kreeg.
2004-02-01
Energy from garbage tempts CPI firms. [Niagara Falls, New York
Energy Technology Data Exchange (ETDEWEB)
This article comments on the fact that there are only 17 energy-from-waste installations in operation in the U.S. and in this respect it lags behind other industrialized nations. Explanations for this gap include the relatively inexpensive garbage disposal as landfill, operating difficulties of some early plants and the high cost of building such facilities. There has been a recent push to build resource-recovery plants and it is believed that chemical companies will probably buy energy products from such plants. Hooker Chemical Co's new energy-from-waste plant at Niagra Falls, N.Y. is described, other companies involved in resource-recovery projects are mentioned, and it is hoped that more companies will invest in such plants.
1980-09-22
Design of the electromagnetic actuator for vibration control of a flexible rotor
Energy Technology Data Exchange (ETDEWEB)
In order to suppress resonance vibrations of a rotor-shaft of rotating machinery, a rotor-shaft system elastically supported by ball bearings which are installed in electromagnetic actuators are proposed and the design method of some compensatory circuits in the controller to control the electromagnetic actuators in the system are explained. These actuators are controlled by the analog PID (proportional, integral, and derivative) controller. The compensation for nonlinearity of electromagnetic force, the negative stiffness of electromagnet, and the time lag of the coil current are discussed and the effective control circuits are proposed. The rotor-shaft system is replaced by the equivalent two-degree-of-freedom system and both impulse and frequency responses are numerically simulated for several parameters of PD-controller gain. By applying the principle of dynamic absorbers, optimum parameters are calculated. The gains of the control circuit are adjusted to give ...
1994-12-21
Carbohydrates/nucleosides/RNA-DNA-ligand interactions
Energy Technology Data Exchange (ETDEWEB)
Carbohydrate and nucleotide structural determination using modern spectroscopic techniques is dependent on our ability to label oligonucleotides and oligosaccharides with stable isotopes. Uniform Carbon 13 and Nitrogen 15 labeling of oligonucleotides is important to present-day efforts, which are focused on determining the structure of relatively small oligosaccharides and oligonucleotides, which form the elements of larger structures. Because of the relatively recent interest in three-dimensional structure, the development of techniques used to label them has lagged behind parallel techniques used to label peptides and proteins. Therefore, this group`s discussion focused primarily on problems faced today in obtaining oligonucleotides labeled uniformly with carbon 13 and nitrogen 15.
1994-12-01
Third order optical nonlinearity of colloidal metal nanoclusters formed by MeV ion implantation
Energy Technology Data Exchange (ETDEWEB)
We report the results of characterization of nonlinear refractive index of the composite material produced by MeV Ag ion implantation of LiNbO{sub 3} crystal (z-cut). The material after implantation exhibited a linear optical absorption spectrum with the surface plasmon peak near 430 nm attributed to the colloidal silver nanoclusters. Heat treatment of the material at 500 C caused a shift of the absorption peak to 550 nm. The nonlinear refractive index of the sample after heat treatment was measured in the region of the absorption peak with the Z-scan technique using a tunable picosecond laser source (4.5 ps pulse width). The experimental data were compared against the reference sample made of MeV Cu implanted silica with the absorption peak in the same region. The nonlinear index of the Ag implanted LiNbO{sub 3} sample produced at five times less fluence is on average two times greater than that of the ...
1998-05-01
International Nuclear Information System (INIS)
In this paper, we show that boron transient enhanced diffusion can be reduced to different extents by varying the distribution of nitrogen atoms in the junction. This is attributed to the relative location of nitrogen atoms with respect to boron profile and end-of-range defect band, affecting the interactions between dopants and defects upon annealing. In addition, variations in boron dopant activation and deactivation are also observed. Similar to fluorine co-implantation, it is proposed that nitrogen atoms react with vacancy point defects to form nitrogen-vacancy clusters that will trap the interstitials emitted from end-of-range defects. However, we report that the interstitial sink efficiency of nitrogen atoms is not as good as the co-implanted carbon atoms, which is noticed from the dopant deactivation curves. In terms of extended defect evolution, the results clearly indicate that end-of-range defects can be stabilized by choosing the ...
2008-12-05
Metallic implants and exposure to radiofrequency radiation
International Nuclear Information System (INIS)
There is increasing use of radiofrequency radiation (RFR) in industry for communications, welding, security, radio, medicine, navigation etc. It has been recognised for some years that RFR may interact with cardiac pacemakers and steps have been taken to prevent this interference. It is less well recognised that other metallic implants may also act as antennas in an RFR field and possibly cause adverse health effects by heating local tissues. There are a large and increasing number of implants having metal components which may be found in RFR workers. These implants include artificial joints, rods and plates used in orthopaedics, rings in heart valves, wires in sutures, bionic ears, subcutaneous infusion systems and (external) transdermal drug delivery patches"1. The physician concerned with job placement of such persons requires information on the likelihood of an implant interacting with RFR so as to ...
Mechanism for transient-enhanced diffusion in ion-implanted silicon
International Nuclear Information System (INIS)
High-dose ion implantation followed by solid-phase-epitaxial (SPE) growth is now a well-established technique for the production of supersaturated silicon alloys. However, these alloys also contain a high supersaturation of silicon interstitials, which give rise to transient, greatly enhanced dopant diffusion with subsequent heating. In this contribution, the authors present a study of a series of Si-Sb alloys of various concentrations which were made by Sb implantation under various conditions to deduce the origin of the observed transient diffusion. A multiple implant scheme was employed to produce samples with an approximately uniform dopant concentration from 40 to 150 nm in depth, but with the amorphous layer extending to a depth of 380 nm. By scaling the implant doses, alloys with different concentrations in the uniform region were produced, allowing an accurate measure of diffusion coefficients ...
1985-03-01
Formation of high resistivity regions in [ital p]-type Al[sub 0. 5]In[sub 0. 5]P by ion implantation
Ion implantation has been applied to magnesium-doped Al[sub 0.5]In[sub 0.5]P to produce high resistivity regions for the first time. Hydrogen, oxygen, and argon ions were implanted at a base dose ranging from 5[times]10[sup 12] to 5[times]10[sup 14] cm[sup [minus]2] and annealed from 400 to 900 [degree]C. Hydrogen did not appreciably compensate the In[sub 0.5]Al[sub 0.5]P layer while oxygen and argon produced sheet resistances up to 1[times]10[sup 9] [Omega]/[open square]. After annealing at 800 [degree]C, regions with high dose oxygen implants maintained a sheet resistance above 1[times]10[sup 7] [Omega]/[open square], while regions with high dose argon implants recovered most of the unimplanted conductivity.
1993-12-06
International Nuclear Information System (INIS)
The use of cathode ray irradiated arterial allografts on the reconstruction of small peripheral arteries is described. The fate of irradiated arterial allografts implanted subcutaneously in rats was compared histologically with that of allografts which were fresh, frozen or stored in 70% alcohol. Follow-up studies were made of 10 dogs in which irradiated arterial allografts had been implanted in the femoral artery to be evaluated; long term patency by arteriography, gross and histologic changes of the implanted allografts, and the luminal surface of the implanted allografts by scanning electron microscopic studies. For the purpose of antigenic studies, extracts of canine arteries which had been irradiated, frozen or stored in 70% alcohol, were prepared and tested by the following immunological methods: precipitation, Ouchterlony gel diffusion, and passive cutaneous anaphylaxis. From the results obtained ...
1976-01-01
International Nuclear Information System (INIS)
Samples of 316L stainless steel, Vitalium and Ti6A14V titanium alloy have been implanted with doses of 1.5, 3, and 4.5 x 10"1"7 Si"+/cm"2. Transmission electron microscopy shows that during ion implantation amorphous layers are formed. When samples of titanium alloy were implanted with a dose of 0.5 x 10"1"7 Si"+/cm"2, the implanted layer consisted of a dispersion of fine silicide crystallites instead of being amorphous. The corrosion resistance was analyzed by electrochemical techniques in 0.9% NaCl at the temperature of 37 C. The increase of corrosion resistance has been observed as a result of structural modifications of the surface layer. (author). 7 refs, 4 tabs.
Energy Technology Data Exchange (ETDEWEB)
Transient enhanced diffusion of phosphorus in silicon has been investigated for implants below and above the threshold for a complete amorphization. Rapid thermal processes (electron beam) and conventional furnaces have been used for the annealing. In the case of implants below amorphization, a strong enhanced diffusion, proportional to the amount of damage produced, has been observed. The extent of the phenomenon is practically independent of the damage depth position. In contrast to this, the formation of extended defects at the original amorphous-crystalline interface makes the diffusivity strongly dependent on depth in the case of post-amorphized samples. No enhanced diffusion effect is observed if the dopant is confined in the amorphous layer, while a remarkable increase in the diffusivity is detected for the dopant located in the crystalline region beyond the amorphous-crystalline interface. Damage distribution after ...
1989-03-01
British Library Electronic Table of Contents (United Kingdom)
Abstract Objectives: The purpose of this study was to evaluate the osseointegration of the dental implants placed into the mandible augmented with different techniques in pigs. Material and methods: Four adult domestic pigs were used. Horizontal augmentation of the mandible was performed in animals by using vascularized femur flap (VFF), non-vascularized femur graft (NVFG) and monocortical mandibular block graft (MG). After 5 months of healing 10 dental implants were placed into each augmented site. The pigs were sacrificed after 3 months of healing. Undecalcified sections were prepared for histomorphometric analysis. Results: Mean bone-implant contact (BIC) values for implants placed into MG, NVFG and VFF were 57.38 11.97%, 76.5 7.88%, 76.53 8.15%, respectively. The BIC values of NVFG and...
2011-01-01
International Nuclear Information System (INIS)
We discuss atomistic simulations of ion implantation and annealing of Si over a wide range of ion dose and substrate temperatures. The DADOS Monte Carlo model has been extended to include the formation of amorphous regions, and this allows simulations of dopant diffusion at high doses. As the dose of ions increases, the amorphous regions formed by cascades eventually overlap, and a continuous amorphous layer is formed. In that case, most of the excess interstitials generated by the implantation are swept to the surface as the amorphous layer regrows, and do not diffuse in the crystalline region. This process reduces the amount of transient enhanced diffusion (TED) during annealing. This model also reproduces the dynamic annealing during high temperature implants. In this case, the local amorphous regions regrow as the implant proceeds, without the formation of a continuous amorphous layer. For ...
2001-06-01
A study of corrosion resistance behavior for W + C dual implanted H13 steel
International Nuclear Information System (INIS)
The surface layer optimized in resistance of corrosion and wear has been obtained by W + C dual implantation on H13 steel. The electrochemical polarization measurements show that the peak current density I_D is increased and then saturated with increasing of voltage scanning loops. The I_D is 100 times smaller than that of H13 steel, and 2-3 times smaller than that of tungsten. Then influence of dual implantation order on corrosion resistance is also studied. The I_D for W_5C_8 implanted first with W is half of that for C_5W_5 implanted first with C. The corrosion resistance structure of the samples after corrosion is observed by SEM. The X-ray analysis indicates that the structure consists of disperse phases of WC, W_2C, FeW, Fe_2W, FeW_2C and iron carbides. It is shown from Auger analysis that the optimum complex layer for corrosion resistance consists of thin carbon film on surface, disperse phases ...
A kinetic Monte Carlo annealing assessment of the dominant features from ion implant simulations
International Nuclear Information System (INIS)
Ion implantation and subsequent annealing are essential stages in today's advanced CMOS processing. Although the dopant implanted profile can be accurately predicted by analytical fits calibrated with SIMS profiles, the damage has to be estimated with a binary collision approximation implant simulator. Some models have been proposed, like the '+n', in an attempt to simplify the anneal simulation. We have used the atomistic kinetic Monte Carlo dados to elucidate which are the implant modeling features most relevant in the simulation of transient enhanced diffusion (TED). For the experimental conditions studied we find that the spatial correlation of the I, V Frenkel pairs is not critical in order to yield the correct I supersaturation, that can be simulated just taking into account the net I-V excess distribution. In contrast to, simulate impurity clustering/deactivation when there is an impurity ...
2004-12-15
Review of potential processing techniques for the encapsulation of wastes in thermoplastic polymers
Energy Technology Data Exchange (ETDEWEB)
Thermoplastic encapsulation has been extensively studied at Brookhaven National Laboratory`s (BNL) Environmental and Waste Technology Center (EWTC) as a waste encapsulation technology applicable to a wide range of waste types including radioactive, hazardous and mixed wastes. Encapsulation involves processing thermoplastic and waste materials into a waste form product by heating and mixing both materials into a homogeneous molten mixture. Cooling of the melt results in a solid monolithic waste form in which contaminants have been completely surrounded by a polymer matrix. Heating and mixing requirements for successful waste encapsulation can be met using proven technologies available in various types of commercial equipment. Processing techniques for thermoplastic materials, such as low density polyethylene (LDPE), are well established within the plastics industry. The majority of commercial polymer processing is accomplished using extruders, mixers or a combination of these ...
1995-08-01
Energy Technology Data Exchange (ETDEWEB)
Large rigid-body domain movements are critical to GroEL-mediated protein folding, especially apical domain elevation and twist associated with the formation of a folding chamber upon binding ATP and co-chaperonin GroES. Here, we have modeled the anisotropic displacements of GroEL domains from various crystallized states, unliganded GroEL, ATP?S-bound, ADP-AlFx/GroES-bound, and ADP/GroES bound, using translation-libration-screw (TLS) analysis. Remarkably, the TLS results show that the inherent motions of unliganded GroEL, a polypeptide-accepting state, are biased along the transition pathway that leads to the folding-active state. In the ADP-AlFx/GroES-bound folding-active state the dynamic modes of the apical domains become reoriented and coupled to the motions of bound GroES. The ADP/GroES complex exhibits these same motions, but they are increased in magnitude, potentially reflecting the decreased stability of the complex after nucleotide hydrolysis. Our results ...
2004-08-12
Waste reduction by separation of contaminated soils during environmental restoration
Energy Technology Data Exchange (ETDEWEB)
During cleanup of contaminated sites, Sandia National Laboratories, New Mexico (SNL/NM) frequently encounters soils with low-level radioactive contamination. The contamination is not uniformly distributed, but occurs within areas of clean soil. Because it is difficult to characterize heterogeneously contaminated soils in detail and to excavate such soils precisely using heavy equipment, it is common for large quantities of uncontaminated soil to be removed during excavation of contaminated sites. This practice results in the commingling and disposal of clean and contaminated material as low-level waste (LLW), or possibly low-level mixed waste (LLMW). Until recently, volume reduction of radioactively contaminated soil depended on manual screening and analysis of samples, which is a costly and impractical approach and does not uphold As Low As Reasonably Achievable (ALARA) principles. To reduce the amount of LLW and LLMW generated during the excavation process, SNL/NM is evaluating two ...
1998-06-01
Organization and safety in nuclear power plants
International Nuclear Information System (INIS)
Perspectives from industry, academe, and the NRC are brought together in this report and used to develop a logical framework that links management and organization factors and safety in nuclear power plant performance. The framework focuses on intermediate outcomes which can be predicted by organizational and management factors, and which are subsequently linked to safety. The intermediate outcomes are efficiency, compliance, quality, and innovation. The organization and management factors can be classified in terms of environment, context, organizational governance, organizational design, and emergent processes. Initial empirical analyses were conducted on a limited set of hypotheses derived from the framework. One set of hypotheses concerned the relationships between one of the intermediate outcome variables, efficiency, as measured by critical hours and outage rate, and safety, as measured by 5 NRC indicators. Results of the analysis suggest that critical hours and outage rates and ...
International Nuclear Information System (INIS)
Classical beam line ion implantation is limited to low energies and cannot achieve P+/N junctions requested for <45nm ITRS node. RTA (rapid thermal annealing) needs to be improved for dopants activation and damage reductions. Spike annealing process also induces a large diffusion mainly due to TED (transient enhanced diffusion). Compared to conventional beam line ion implantation limited to a minimum energy implantation of 200eV, plasma immersion ion implantation (PIII) is an emerging technique to get ultimate shallow profiles (as-implanted) due to no lower limitation of energy and high dose rate. On the another hand, laser thermal processing (LTP) allows to obtain very shallow junction with no TED, abrupt profile and activated depth control. In this paper, we show the implementation of the BF_3 PIII associated with the LTP. Ions from BF_3"+ plasma have been ...
2005-08-01
The effects of cosmic radiation on implantable medical devices
Energy Technology Data Exchange (ETDEWEB)
Metal oxide semiconductor (MOS) integrated circuits, with the benefits of low power consumption, represent the state of the art technology for implantable medical devices. Three significant sources of radiation are classified as having the ability to damage or alter the behavior of implantable electronics; Secondary neutron cosmic radiation, alpha particle radiation from the device packaging and therapeutic doses(up to 70 G{gamma}) of high energy radiation used in radiation oncology. The effects of alpha particle radiation from the packaging may be eliminated by the use of polyimide or silicone rubber die coatings. The relatively low incidence of therapeutic radiation incident on an implantable device and the use of die coating leaves cosmic radiation induced secondary neutron single event upset (SEU) as the main pervasive ionising radiation threat to the reliability of implantable devices. A ...
1996-12-31
Impurity and clustering effects on defect evolution in ion-implanted Si
Energy Technology Data Exchange (ETDEWEB)
A detailed investigation of the damage formation and evolution in ion-implanted crystalline Si is presented. Deep-level transient spectroscopy has been used to monitor room temperature migration of point defect complexes and evolution from simple point-like defect complexes to defect clusters and even extended defects. Si samples were implanted with Si or He ions with energies of 145 keV-3MeV, to fluences in the range 5x10[sup 8]-5x10[sup 13]cm[sup -2]. The effects of thermal annealing, in the range 100-680 C and 10 min-15h, were also explored. A systematic comparison of defect complexes formation and evolution in ion-implanted or electron-irradiated Si samples with a different impurity content were used to assess the role of impurities (C and O), extra implanted ion and defect clustering on the nature and thermal stability of residual damage. In particular, an interstitial excess directly resulting ...
1998-10-01
International Nuclear Information System (INIS)
Plasma immersion ion implantation (PIII) is an effective materials modification and synthesis technique but has seldom been applied to ceramic materials due to the high electrical resistance that reduces the ion bombardment energy and sometimes causes serious electrical arcing in the instrument. Even in cases where PIII is applicable, the surface properties of the implanted insulating materials can be seriously affected due to the low ion energy and materials damage from electrical arcing. In order to enhance the surface and mechanical properties such as wear resistance of ceramic materials used in many industrial applications, surface modification is needed. In this work, we conduct carbon implantation into sintered #alpha#-SiC (silicon carbides that are widely used in vacuum ceramic bearings) using mesh-assisted plasma immersion ion implantation to enhance the surface properties. The use of a ...
2004-03-01
Ultrashallow P{sup +}/N junction formation by plasma ion implantation
Energy Technology Data Exchange (ETDEWEB)
We investigated the electrical characteristics and the junction depth of ultra-shallow junctions formed by using the plasma-doping method. Compared with ultra-low energy boron-ion implantation at 500 eV, the junctions formed with the plasma-doping process exhibited shallow junction depths and low sheet resistances. The junction depths of the plasma-doped samples were 150 A and 330 A after annealing for 10 s at 900 .deg. C and 950 .deg. C, respectively. For the same junction depth, the sheet resistance of the B{sub 2}H{sub 6} plasma-doped sample was an order of magnitude less than that of the 500-eV B-ion implanted sample. Cross-sectional transmission electron microscopy and deep level transient spectroscopy showed that the defects formed by the B{sub 2}H{sub 6} plasma-doping process could be removed by annealing at 950 .deg. C for 10 s. The scaling of metal-oxide-semiconductor field-effect-transistor (MOSFET) device channel lengths for ...
2000-12-01
Ultrashallow P"+/N junction formation by plasma ion implantation
International Nuclear Information System (INIS)
We investigated the electrical characteristics and the junction depth of ultra-shallow junctions formed by using the plasma-doping method. Compared with ultra-low energy boron-ion implantation at 500 eV, the junctions formed with the plasma-doping process exhibited shallow junction depths and low sheet resistances. The junction depths of the plasma-doped samples were 150 A and 330 A after annealing for 10 s at 900 .deg. C and 950 .deg. C, respectively. For the same junction depth, the sheet resistance of the B_2H_6 plasma-doped sample was an order of magnitude less than that of the 500-eV B-ion implanted sample. Cross-sectional transmission electron microscopy and deep level transient spectroscopy showed that the defects formed by the B_2H_6 plasma-doping process could be removed by annealing at 950 .deg. C for 10 s. The scaling of metal-oxide-semiconductor field-effect-transistor (MOSFET) device channel lengths for high-speed application ...
2000-12-01
International Nuclear Information System (INIS)
In this letter, the effect of vacancies generated by preirradiated laser on dopant diffusion and activation in preamorphized silicon substrate has been studied. Laser-induced melting in silicon was used to generate excess vacancies near the maximum melt depth before silicon substrate amorphization and subsequent boron implantation. We demonstrate that by matching the preirradiated laser melt depth with the implant amorphize depth, it can effectively reduce the silicon self-interstitials released from the end-of-range defect band. The results show great suppression in boron transient enhanced diffusion and significant removal of end-of-range defects. This is attributed to the recombination of laser-generated excess vacancies with preamorphizing induced free silicon interstitials at the end-of-range region.
2008-05-19
Transient enhanced diffusion in B/sup +/ and P/sup +/ implanted silicon
International Nuclear Information System (INIS)
The authors report the transient enhanced diffusion of supersaturated phosphorous in ion-implanted SPE grown Si. Precipitation proceeds rapidly to a metastable SiP phase, which can be converted to an orthorhombic form or re-dissolved by subsequent heat treatment. The effects are strongly temperature dependent, and consistent with the trapped interstitial model. The behavior of different dopants follow their relative interstitialcy diffusion coefficients. The results suggest that ion implantation induced point defects dominate over thermally activated point defects during low temperature and certain rapid thermal processing, controlling dopant deactiviation and diffusion in crystalline or amorphous silicon, and can also affect the SPE growth rate.
The fraction of substitutional boron in silicon during ion implantation and thermal annealing
Energy Technology Data Exchange (ETDEWEB)
We present results from a kinetic Monte Carlo simulation of boron transient enhanced diffusion (TED) in silicon. Our approach avoids the use of phenomenological fits to experimental data by using a complete and self-consistent set of values for defect and dopant energetics derived mostly from {ital ab initio} calculations. The results predict that, during annealing of 40 keV B-implanted Si at 800{degree}C, there exists a time window during which all the implanted boron atoms are substitutional. At earlier or later times, the interactions between free silicon self-interstitials and boron atoms drive the growth of boron clusters and result in an inactive boron fraction. The results show that the majority of boron TED takes place during the growth period of interstitial clusters and not during their dissolution. {copyright} {ital 1998 American Institute of Physics.}
1998-05-01
The fraction of substitutional boron in silicon during ion implantation and thermal annealing
International Nuclear Information System (INIS)
We present results from a kinetic Monte Carlo simulation of boron transient enhanced diffusion (TED) in silicon. Our approach avoids the use of phenomenological fits to experimental data by using a complete and self-consistent set of values for defect and dopant energetics derived mostly from ab initio calculations. The results predict that, during annealing of 40 keV B-implanted Si at 800 degree C, there exists a time window during which all the implanted boron atoms are substitutional. At earlier or later times, the interactions between free silicon self-interstitials and boron atoms drive the growth of boron clusters and result in an inactive boron fraction. The results show that the majority of boron TED takes place during the growth period of interstitial clusters and not during their dissolution. copyright 1998 American Institute of Physics.
1998-05-01
Study of point defect detectors in Si
International Nuclear Information System (INIS)
The importance of point defects in semiconductor and function materials has been studied in detail, but effective means for detecting point defects has not been available for a long time. The end of range defects in Si, produced by 140 keV Ge"+ implantation, were investigated as detectors for measuring the interstitial concentration created by 42 keV B"+ implantation. The concentration of interstitial resulting from the B"+ implantation and the behavior of the interstitial flux under different annealing condition were given. The enhanced diffusion in the boron doped EPI marker, resulting from mobile non-equilibrium interstitials was demonstrated to be transient. Interstitial fluxes arising from processing can be detected by transient enhanced diffusion (TED) of doped marker layers as well
1999-05-01
Redistribution of implanted dopants after metal-silicide formation
The redistribution of implanted As and Sb following metal-silicide formation of Pt, Pd, and Ni has been studied. The phases of the silicides used were PtSi, Pd/sub 2/Si, and NiSi. Investigations with Rutherford backscattering analysis showed that after the formation of the silicides, the Sb was always found in the silicide layer near the surface of the samples, whereas PtSi and Pd/sub 2/Si caused a partial rejection of As for implanted doses of 2 x 10/sup 15/ cm/sup -2/ and higher. No rejection of As was found after the formation of NiSi. The results are discussed in terms of solid solubilities and impurity-metal compound formation. The data presented has implications in the fabrication of Ohmic contacts and the adjustments of the heights of Schottky barriers on silicon.
1978-12-01
Redistribution of implanted dopants after metal-silicide formation
International Nuclear Information System (INIS)
The redistribution of implanted As and Sb following metal-silicide formation of Pt, Pd, and Ni has been studied. The phases of the silicides used were PtSi, Pd_2Si, and NiSi. Investigations with Rutherford backscattering analysis showed that after the formation of the silicides, the Sb was always found in the silicide layer near the surface of the samples, whereas PtSi and Pd_2Si caused a partial rejection of As for implanted doses of 2 x 10"1"5 cm"-"2 and higher. No rejection of As was found after the formation of NiSi. The results are discussed in terms of solid solubilities and impurity-metal compound formation. The data presented has implications in the fabrication of Ohmic contacts and the adjustments of the heights of Schottky barriers on silicon.
Prediction of transient-enhanced diffusion during rapid thermal annealing of ion-implanted silicon
International Nuclear Information System (INIS)
There have been several reports of transient-enhanced diffusion during furnace or rapid thermal annealing of ion-implanted silicon and some reports of no enhancement. In this contribution, the authors show that many of the observed effects can be accounted for by an interstitial trapping mechanism, in which large numbers of Si atoms are trapped by group V dopant atoms in the amorphous material during implantation. These trapped atoms are retained during solid-phase-epitaxial (SPE) growth, but can be released later during thermal processing to give the transient-enhanced diffusion. The authors present a model which can predict the transient effects (or lack of them) for any concentration of Sb, Bi, or As dopants sufficient to amorphize the silicon and any thermal processing technology which relies on SPE growth (furnace, cw laser, or rapid thermal annealing).
1985-03-01
International Nuclear Information System (INIS)
The present work is a research of the effect of helium on the microstructure, mechanical properties and fracture behaviors of a type 316 austenitic steel. Helium implantation was performed by 30-MeV #alpha#-particle injection on very small size specimens, using a cyclotron. Average helium content in a He-deposited region was up to 2000 appm He. In the case of 2000appm He implantation, intergranular fracture was sometimes observed on the helium deposited region after tensile test at room temperature. At elevated temperature test, however, this material showed the transition of fracture mode from transgranular-ductile fracture at 773K to intergranular fracture at 873. In the case of 500 appm He implantation, the transition of fracture mode was recognized at a temperature range of 873K to 973K. (author).
International Nuclear Information System (INIS)
The effect of helium on the mechanical properties and fracture behaviors of a type 316 austenitic steel is presented. Helium implantation was performed by 30-MeV #alpha#-particle injection on very small, thin specimens, using a cyclotron accelerator. Average helium content in the He-deposited region was 50 to 2000 appm He. These specimens showed the transition of fracture mode from transgranular to intergranular fracture in elevated temperature tests. The transition temperature decreased with increase in the amount of implanted helium. For example, in the case of 2000 appm and 500 appm He implantation, the transition temperatures were between 773 and 873 K and 873 and 973 K, respectively. (orig.).
British Library Electronic Table of Contents (United Kingdom)
Abstract Objective: To compare the vertical dimensional changes with regard to graft height in a long-term follow-up in patients treated with two different grafting materials used in maxillary sinus floor elevation procedures. Material and methods: Twenty consecutive patients were included. One group was grafted with autogenous bone from the mandible (chin area), and the other group was augmented with a 100%b-tricalcium phosphate (b-TCP). During a 4- to 5-year period, in each patient, at least five panoramic radiographs were made. These panoramic radiographs were used for morphometric measurements, at three different locations. The three locations were the first bone to implant contact at the distal side of the second most posterior implant (L1), halfway between this implant and the most p...
2009-01-01
International Nuclear Information System (INIS)
Chronic mesenteric arterial ischemia is an uncommon condition associated a high morbidity and mortality. It is most Commonly caused by atherosclerotic occlusive disease. Patients may suffer epigastric or periumbilical postprandial pain ten to thirty minutes after eating. A case of chronic mesenteric artery stenosis, the diagnosis was performance with colonoscopy and biopsy. We present a case report of a patient with chronic mesenteric ischemia. Mesenteric arteriography was performed and documented estenosis of the mesenteric superior artery. Then percutaneous arteriography with angioplasty and implant of stent was performed. The patients became completely asymptomatic and normal colon mucous is observed in control colonoscopy. The purpose of this report is to present the case endoscopy, clinic and radiological features and to describe the percutaneous angioplasty and implant of stent. We believe that angioplasty treatment offers and improvement ...
International Nuclear Information System (INIS)
We have simulated the transient enhanced diffusion (TED) of boron fluoride (BF_2"+) implanted in crystalline and germanium amorphized silicon. Based on recently published models, the effect of fluorine on boron diffusion in silicon has been introduced and a modelling has been suggested. In order to simulate the boron experimental profiles, we have assumed that fluorine forms clusters involving interstitial boron which reduces the junction depth. Experimental results indicate that fluorine behaviour depends on amorphization energy. Moreover, even no germanium preamorphization is performed, silicon is still amorphized by fluorine species. Hence, BF_2"+ implantation leads to an amorphous/crystalline (a/c) interface near the surface. An improvement of published models is suggested taking into account fluorine effects. The simulations satisfactory reproduce the SIMS experimental profiles for a large scale of experimental conditions.
2002-01-01
Effects of ion irradiation on the diffusion of pre-implanted B atoms in crystalline silicon
International Nuclear Information System (INIS)
N-type crystalline Si (100) implanted with 5 keV B ions was subsequently irradiated with MeV Si, O and F ions. The B atom profiles were measured by means of secondary ion mass spectrometer after the treatment of rapid thermal annealing. The results show that the transient enhanced diffusion of B atoms is effectively limited by the post-implantation of high energy ions at high dose. At the same irradiation conditions, it is found that the existence of a SiO_2 layer in the near surface of Si is even more effective in suppressing the transient enhanced diffusion of the doped B atoms. The results are qualitatively discussed in combination with the analyses of RBS/c measurements and calculation of the DICADA code
2001-12-01
Effect of zinc and its form of supply on production and quality of coffee beans
British Library Electronic Table of Contents (United Kingdom)
Abstract BACKGROUND: In Brazil, the usual forms of zinc (Zn) supply to coffee plants have limitations that compromise the element availability to the plant. This study proposes to test an alternative approach to supplying the nutrient to Coffea arabica L. using trunk implanted zinc tablets. Additionally, the effect of Zn on the production and quality of coffee beans was also evaluated. RESULTS: The highest total coffee bean production was recorded in plants implanted with Zn tablets (TA), while the lowest was recorded in the control treatment, without zinc supply (WZn), reaching a bianual production of 188.2 and 130.1 60-kg bags of processed beans per hectare, respectively. In the treatments where Zn were applied as tablet implantation or as foliage spraying (SZn); the bean size was larger...
2011-01-01
Characterization of polysilicon thin-film transistors with asymmetric source/drain implantation
Energy Technology Data Exchange (ETDEWEB)
The effect of asymmetry tilt angle ion implantation on polysilicon thin-film transistors (TFTs) device characteristics are investigated. This asymmetric source/drain (S/D) TFTs structure exhibits low leakage current and suppressed kink effect due to the relief of higher electric field near the drain junction side. It is shown that the optimal implantation tilt angle is 30 deg. in our annealing condition. And the anomalous off-state current is more than two orders of magnitude lower than that of the conventional TFTs. By well controlled the LDD region, this structure can act as a conventional structure in the on-state and the turn-on current will not be degraded. Besides, the device under severe hot carrier bias stress shows better hot carrier endurance.
2005-08-01
Energy Technology Data Exchange (ETDEWEB)
On 10 dialysis patients we performed 12 balloon dilatations, 2 catheter lyses, 6 stent implants (Palmaz stent) and one atherectomy of central venous stenoses or occlusions (v. subclavia, v. brachiocephalica) at the shunt arm of the patient. The primary success rate was, in balloon PTA and lysis, 12/14 interventions, and in stent placement and atherectomy 7/7. The angiographical and clinical primary result after stent implantation was significantly better than after conventional dilatation. After 66% of the balloon dilatations recidivation occurred within the first year; this can be treated by means of repeated PTA. Whether long-term exclusion of recurrence can be achieved by stent implantation, must be established by means of follow-up studies that are at present in progress. (orig.).
1990-09-01
Atomic scale models of Ion implantation and dopant diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
We review our recent work on an atomistic approach to the development of predictive process simulation tools. First principles methods, molecular dynamics simulations, and experimental results are used to construct a database of defect and dopant energetics in Si. This is used as input for kinetic Monte Carlo simulations. C and B trapping of the Si self- interstitial is shown to help explain the enormous disparity in its measured diffusivity. Excellent agreement is found between experiments and simulations of transient enhanced diffusion following 20-80 keV B implants into Si, and with those of 50 keV Si implants into complex B-doped structures. Our simulations predict novel behavior of the time evolution of the electrically active B fraction during annealing.
1999-03-01
British Library Electronic Table of Contents (United Kingdom)
Abstract Introduction.- Infection is the worst complication seen with inflatable penile prosthesis (IPP). Both the American Medical Systems (AMS) and Coloplast IPP have infection retardant coatings. AMS is coated at the factory with rifampicin and minocycline (InhibiZone). The Coloplast IPP has a hydrophilic coating covalently bonded to its components that will absorb any aqueous solution before implantation and provides increased surface lubricity to decrease bacterial adherence. Aim.- We tested several antibiotic dips comparing zones of inhibition (ZOI) against five commonly infecting bacteria with coated Coloplast implants. Results were compared with those ZOI created with strips of an AMS IPP precoated with InhibiZone. Methods.- Pieces of sterile Coloplast Titan IPP were dipped in (i) ...
2011-01-01
UK PubMed Central (United Kingdom)
BackgroundWe aimed to compare visual and refractive outcome following phacoemulsification and intraocular lens implant (IOL) and combined one-site phacotrabeculectomy.MethodWe...Full Text Available
2008-09-01
Transient enhanced diffusion in ion-implanted silicon
Energy Technology Data Exchange (ETDEWEB)
We discuss the transient-enhanced diffusion of Sb, As, P, In, Ga, and B in ion-implanted Si, where the near-surface region has been amorphized by the dopant or by a self-implantation process. With Sb, a large transient diffusion enhancement is observed proportional to dopant concentration. For Sb, As, P, and In, the enhancement follows the relative interstitialcy diffusion coefficient. We believe this behavior is caused by stable implantation-induced point defects present in the amorphous surface layer, which decay during thermal processing to release high concentrations of self-interstitials. This process occurs in competition with the solid phase epitaxial (SPE) growth process, and for high dopant concentrations can occur in the amorphous phase ahead of the crystallization front. We believe this may be the origin of the dopant redistribution which can occur during SPE growth, which sets the upper limit to the dopant ...
1987-03-01
Transcatheter stent implantation to treat aortic coarctation in infancy.
UK PubMed Central (United Kingdom)
A ten week old girl who had previously undergone a palliative procedure for the hypoplastic left heart syndrome had unrelieved aortic coarctation that did not respond to standard balloon dilatation....Full Text Available
1993-01-01
UK PubMed Central (United Kingdom)
Peri-prosthetic infections are notoriously difficult to treat as the biomaterial implant is ideal for bacterial adhesion and biofilm formation, resulting in decreased antibiotic sensitivity....Full Text Available
2008-12-01
International Nuclear Information System (INIS)
High-power arc lamp design has enabled ultrahigh-temperature (UHT) annealing as an alternative to conventional rapid thermal processing (RTP) for ultrashallow junction formation. The time duration of the UHT annealing technique is significantly reduced from those obtained through conventional RTP. This difference in time may offer the ability to maintain a highly activated ultrashallow junction without being subjected to transient enhanced diffusion (TED), which is typically observed during postimplant thermal processing. In this study, two 200-mm (100) n-type Czochralski-grown Si wafers were preamorphized with either a 48- or a 5-keV Ge"+ implant to 5x10"1"4 cm"2, and subsequently implanted with 3-keV BF_2"+ molecular ions to 6x10"1"4 cm"2. The wafers were sectioned and annealed under various conditions in order to investigate the effects of the UHT annealing technique on the resulting junction characteristics. The main point of the paper is ...
2005-02-15
The development of multiple probe microdialysis sampling in the stomach
UK PubMed Central (United Kingdom)
A multiple probe approach of implanting microdialysis probes into each separate tissue layer would better represent sampling from the stomach. Presently, microdialysis sampling experiments are...Full Text Available
2008-09-10
The association between metal allergy, total hip arthroplasty, and revision
UK PubMed Central (United Kingdom)
Background and purpose It has been speculated that the prevalence of metal allergy may be higher in patients with implant failure. We compared the prevalence and cause of revisions following...Full Text Available
2009-12-04
British Library Electronic Table of Contents (United Kingdom)
PurposeThis prospective study followed 61 patients who were partially dentulous and considered to have insufficient bone volume for routine implant treatment and consequently underwent sinus inlay bone grafting.Patients and MethodsThe patients were treated with maxillary sinus floor augmentation with particulated autogenous bone from the mandibular ramus/corpus. After a healing period, dental implants (n = 180) were installed.ResultsRadiographic examination revealed average residual vertical bone heights of 6.5 mm in the first premolar region, 3.8 mm in the second premolar region, 3.5 mm in the first molar region, and 2.6 mm in the second molar region. The average implant lengths were 12 mm in the first premolar region and 11 mm in the second premolar, first, and second molar regions. All ...
2008-01-01
The Oxidation Behavior of CoCrAlY, CoCrAl and Yttrium ...
... ADD137758. Title : The Oxidation Behavior of CoCrAlY, CoCrAl and Yttrium-Implanted CoCrAl Alloys Compared and Contrasted,. ...
1987-11-01
Temporal Interactions during Paired-Electrode Stimulation in Two Retinal Prosthesis Subjects
UK PubMed Central (United Kingdom)
Purpose.Since 2002, six blind patients have undergone implantation of an epiretinal 4 × 4 electrode array designed to directly stimulate the remaining cells of the retina...Full Text Available
2011-01-01
Simulation of p-type diffusion in compound semiconductor: the case of beryllium implanted in InGaAs
Energy Technology Data Exchange (ETDEWEB)
A system of equations describing transient enhanced diffusion of beryllium in InGaAs due to kick-out mechanism or due to formation, migration, and dissociation of the pairs ''beryllium atom-group III self-interstitial'' is proposed and analyzed. Simulation of coupled diffusion of beryllium atoms and self-interstitials in InGaAs during rapid thermal annealing was done for the case of dual implantation. For the experiment under consideration the first ion implantation of phosphorus atoms produced the region of extended defects that led to ''uphill'' diffusion of implanted Be in the defect region and in the vicinity of the surface. The suggested reason of ''uphill'' diffusion could be related to the nonuniform distribution of group III self-interstitials that was formed due to the absorption of point defects on the ...
2006-10-15
Removable Partial Denture in a Cleft Lip and Palate Patient: A Case Report
UK PubMed Central (United Kingdom)
This clinical report described the oral rehabilitation of a cleft lip and palate patient with removable partial denture. Although implant-supported fixed treatment was presented as part of the optimum...Full Text Available
2008-10-01
Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy
Energy Technology Data Exchange (ETDEWEB)
Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly ...
1997-09-01
Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6Al-4V alloy
International Nuclear Information System (INIS)
Nitrogen ion implantation improves the wear resistance of Ti-6Al-4V alloys by forming a hard TiN superficial passivation layer. However, the thickness of the layer formed by traditional ion implantation is typically 100-200 nm and may not be adequate for many industrial applications. We propose to use radio-frequency (RF) plasma nitriding and nitrogen plasma immersion ion implantation (PIII) to increase the layer thickness. By using a newly designed inductively coupled RF plasma source and applying a series of negative high voltage pulses to the Ti-6Al-4V samples. RF plasma nitriding and nitrogen PIII can be achieved. Our process yields a substantially thicker modified layer exhibiting more superior wear resistance characteristics, as demonstrated by data from micro-hardness testing, pin-on-disc wear testing, scanning electron microscopy (SEM), as well as Auger electron spectroscopy (AES). The performance of our newly ...
1996-09-15
UK PubMed Central (United Kingdom)
BackgroundThis study aimed to assess whether endoscopic implantation of an injectable esophageal prosthesis, the Gatekeeper Reflux Repair System (GK), is a safe and effective therapy...Full Text Available
2010-06-01
International Nuclear Information System (INIS)
In this work we report a study of the induced changes in structure and corrosion behavior of martensitic stainless steels nitrided by plasma immersion ion implantation (PI"3) at different previous heat treatments. The samples were characterized by x-ray diffraction and glancing angle x-ray diffraction, scanning electron microscopy, energy dispersive x-ray spectroscopy, and potentiodynamic measurements. Depending on the proportion of retained austenite in the unimplanted material, different phase transformations are obtained at lower and intermediate temperatures of nitrogen implantation. At higher temperatures, the great mobility of the chromium yields CrN segregations like spots in random distribution, and the #alpha#"'-martensite is degraded to#alpha#-Fe (ferrite). The nitrided layer thickness follows a fairly linear relationship with the temperature and a parabolic law with the process time. The corrosion resistance depends strongly on ...
2006-09-01
Energy Technology Data Exchange (ETDEWEB)
Plasma Immersion Ion Implantation (PIII) is a new hybrid technology for surface treatment of materials based on the principles of plasma nitriding and ion implantation. The equipment and the operation of the system are introduced. As well as providing an alternate method of ion implantation, it is possible to combine energetic ion bombardment with plasma nitriding. Different metal materials and treatment conditions have been studied. The capability of PIII-treatment to improve the properties of a wide range of metals has been proven. Application for forming tools and their industrial test has been successful. (orig.) [Deutsch] Die Plasmaimmersionsimplantation (PIII) ist eine neue Hybridtechnologie zur Behandlung von Werkstoffoberflaechen und basiert auf den Prinzipien des Plasmanitrierens und der Ionenimplantation. Die Anlagentechnik und die Arbeitsweise werden vorgestellt. Verfahrensspezifische Vorteile entstehen durch die ...
1995-01-01
Palliation of malignant esophageal obstruction and fistulas with self expandable metallic stents
UK PubMed Central (United Kingdom)
AIM: To evaluate the efficacy of self expandable metallic stents (SEMS) in patients with malignant esophageal obstruction and fistulas.METHODS: SEMS were implanted in the presence of fluoroscopic...Full Text Available
2010-12-07
Oxygen-concentration dependent enhancement of positive secondary ion emission from silicon
Energy Technology Data Exchange (ETDEWEB)
The enhancement of positive secondary ion yields of silicon due to the presence of oxygen has been investigated quantitatively by low-energy (5 keV) oxygen implantation. Implantation and sputter profiling with 9 keV In/sup +/ were performed in the same ion microprobe instrument. Depth profiles of substrate and implanted oxygen atoms were measured for fluences ranging from 5x10/sup 15/ to 4x10/sup 16/ O-atoms/cm/sup 2/. The oxygen concentration, c(O), in the sample was deduced from the implanted fluence and the range distribution in the Gaussian approximation. It was found that the oxygen-enhanced Si/sup +/ intensity is proportional to c(O)sup(x) (with x=1.4) in the concentration regime, 1.5<=c(O)<=30 at%. The O/sup +/ intensity shows a similar dependence for c(O)> or approx.20 at.%.
1983-12-15
UK PubMed Central (United Kingdom)
BackgroundObservational clinical studies have shown that patients with diabetes have less favorable results after percutaneous coronary intervention compared with the non-diabetic...Full Text Available
Morbidity using subcutaneous ports and efficacy of vancomycin flushing in cancer.
UK PubMed Central (United Kingdom)
An evaluation of totally implanted venous access systems inserted in 163 consecutive children with cancer is reported. From 1988 to 1994, 180 subcutaneous ports were inserted in children more than 1...Full Text Available
1995-04-01
Energy Technology Data Exchange (ETDEWEB)
MRT criteria have been developed to distinguish between tumour and implant material following examination of 50 patients who had transsphenoidal hypophysectomies for tumours. Judgements were based on the postoperative hormonal status and the operation notes. Following contrast injection of Gd-DTPA and using T[sub 1] weighted spin-echo sequences, implant material appeared as sandwich-like, linear or circular structures. Residual recurrent tumour produced homogenous or non-homogenous aspects without marginal enhancement in 84% of cases. Postoperative displacement of the infundibulum to the opposite side was observed in 73% of patients with tumour remnants. Sensitivity of MRT was 70%, specificity 95%. There was a positive predictive value of 94% and a negative predictive value of 72% with an accuracy of 81%. This provides assistance in differentiating between tumour remnants and implant material. MRT is recommended as a method ...
1993-06-01
MRT in differentiation between tumour and implant material in the postoperative sella
International Nuclear Information System (INIS)
MRT criteria have been developed to distinguish between tumour and implant material following examination of 50 patients who had transsphenoidal hypophysectomies for tumours. Judgements were based on the postoperative hormonal status and the operation notes. Following contrast injection of Gd-DTPA and using T_1 weighted spin-echo sequences, implant material appeared as sandwich-like, linear or circular structures. Residual recurrent tumour produced homogenous or non-homogenous aspects without marginal enhancement in 84% of cases. Postoperative displacement of the infundibulum to the opposite side was observed in 73% of patients with tumour remnants. Sensitivity of MRT was 70%, specificity 95%. There was a positive predictive value of 94% and a negative predictive value of 72% with an accuracy of 81%. This provides assistance in differentiating between tumour remnants and implant material. MRT is recommended as a method of ...
Left Main Stent Thrombosis Complicated by Eptifibatide-Induced Acute Thrombocytopenia
UK PubMed Central (United Kingdom)
A 57-year-old man with a history of coronary artery disease and placement of an implantable cardioverter-defibrillator presented at our emergency room with an anterior ST-elevation myocardial infarction....Full Text Available
2011-01-01
UK PubMed Central (United Kingdom)
AimsTranscatheter treatment of heart valve disease is well established today. However, for the treatment of tricuspid regurgitation (TR), no effective catheter-based approach is...Full Text Available
2011-05-01
UK PubMed Central (United Kingdom)
Human endometrium resists embryo implantation except during the 'window of receptivity'. A change in endometrial gene expression is required for the development of receptivity. Uterine calbindin-D28k...Full Text Available
Experiments on the formation of the A 15-compounds Nb-Sn and Nb-Ge by ion implantation
International Nuclear Information System (INIS)
Nb_3Sn films (Tsub(c)=17.8 K) were obtained by implantation of Sn"+ ions into Nb films (1500 A thick) after subsequent annealing. The annealing temperature required for the formation of the A15 phase in the implanted films was about 100 K higher than for Nb-Sn sandwich films evaporated at 300 K. The influence of the Sn concentration and of the annealing temperature was studied by measuring the sample resistance. The Nb-Sn compounds formed during the annealing process were analysed by measurements of the Moessbauer-effect of "1"1"9Sn. The implantation method was also used to produce Nb-Ge films with a ratio Ge/Nb approximately 1/3. The Ge-concentration and the temperature of the Nb-target (300-1070 K) were varied. These variations as well as subsequent annealing at 600-850"0C did not lead to superconducting transition temperatures above 8 K. (Auth.).
Effects of introducing low-frequency harmonics in the perception of vocoded telephone speech1
UK PubMed Central (United Kingdom)
Several studies have demonstrated that telephone use presents a challenge for most cochlear implant (CI) users, and this is attributed mainly to the narrow bandwidth (300–3400 Hz) introduced...Full Text Available
2010-09-01
UK PubMed Central (United Kingdom)
Restenosis remains the main complication of balloon angioplasty and/or stent implantation. Preclinical testing of new pharmacologic agents preventing restenosis largely rely on porcine models, where...Full Text Available
Energy Technology Data Exchange (ETDEWEB)
(001) CZ silicon wafers were implanted with arsenic (As{sup +}) at energies of 10--50 keV to doses of 2 {times} 10{sup 14} to 5 {times} 10{sup 15}/cm{sup 2}. All implants were amorphizing in nature. The samples were annealed at 700 C for 16 hrs. The resultant defect microstructures were analyzed by XTEM and PTEM and the As profiles were analyzed by SIMS. The As profiles showed significantly enhanced diffusion in all of the annealed specimens. The diffusion enhancement was both energy and dose dependent. The lowest dose implant/annealed samples did not show As clustering which translated to a lack of defects at the projected range. At higher doses, however, projected range defects were clearly observed, presumably due to interstitials generated during As clustering. The extent of enhancement in diffusion and its relation to the defect microstructure is explained by a combination of factors including surface recombination of ...
1997-11-01
International Nuclear Information System (INIS)
(001) CZ silicon wafers were implanted with arsenic (As"+) at energies of 10--50 keV to doses of 2 x 10"1"4 to 5 x 10"1"5/cm"2. All implants were amorphizing in nature. The samples were annealed at 700 C for 16 hrs. The resultant defect microstructures were analyzed by XTEM and PTEM and the As profiles were analyzed by SIMS. The As profiles showed significantly enhanced diffusion in all of the annealed specimens. The diffusion enhancement was both energy and dose dependent. The lowest dose implant/annealed samples did not show As clustering which translated to a lack of defects at the projected range. At higher doses, however, projected range defects were clearly observed, presumably due to interstitials generated during As clustering. The extent of enhancement in diffusion and its relation to the defect microstructure is explained by a combination of factors including surface recombination of point defects, As ...
1996-12-02
Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon
Energy Technology Data Exchange (ETDEWEB)
Several models have been proposed for the simulation of boron diffusion during annealing after implantation in silicon. It has been shown that transient enhanced diffusion (TED) tends to disappear at sub-keV implant energies. Under these conditions boron concentration is higher than the boron solubility limit value, precipitation phenomena occur. Extended defects ({l_brace}3 1 1{r_brace}, EOR) formation and boron precipitation affect both the redistribution during the annealing and activation of the boron. For these reasons, we have investigated the diffusion of low energy boron implanted in crystalline silicon and tested a complete simulation program which takes into account the effects of type I defects as a sink for self-interstitials and of boron precipitation. Experimental results have been simulated and consistent parameters have been found to fit the data. Boron enhanced diffusion effect has been studied. Model ...
2004-02-01
Diffusion simulations of boron implanted at low energy (500 eV) in crystalline silicon
International Nuclear Information System (INIS)
Several models have been proposed for the simulation of boron diffusion during annealing after implantation in silicon. It has been shown that transient enhanced diffusion (TED) tends to disappear at sub-keV implant energies. Under these conditions boron concentration is higher than the boron solubility limit value, precipitation phenomena occur. Extended defects (#left brace#3 1 1#right brace#, EOR) formation and boron precipitation affect both the redistribution during the annealing and activation of the boron. For these reasons, we have investigated the diffusion of low energy boron implanted in crystalline silicon and tested a complete simulation program which takes into account the effects of type I defects as a sink for self-interstitials and of boron precipitation. Experimental results have been simulated and consistent parameters have been found to fit the data. Boron enhanced diffusion effect has been studied. ...
2004-02-01
Diffusion mechanism of implanted Be in GaAs
Energy Technology Data Exchange (ETDEWEB)
The transient enhanced diffusion of low and high dose implanted beryllium in undoped gallium arsenide during post-implant rapid thermal annealing in the temperature range of 700-900 C for 60-240 s has been studied and successfully simulated by the kick-out diffusion model, involving singly positively charged Be interstitials and doubly positively charged Ga self-interstitials. Using the ''plus one'' approach for Ga interstitial generation after implantation with the local Ga interstitial sink concept as well as the appropriate initial and boundary conditions for involved mobile species, and taking into account Fermi-level and built-in electric field effects, the obtained partial differential equations have been solved numerically by means of an explicit finite difference method. The thermal equilibrium concentrations and the diffusivities of Be and Ga interstitials, all as a function of ...
2008-01-15
International Nuclear Information System (INIS)
Introduction: There are many problems in the radiological diagnosis of aseptic loosening in total hip arthroplasty. Computed tomography (CT) and magnetic resonance tomography (MRT) are not usable for metallic implants (stainless steel, cobalt alloy, titanium alloy). Material and Methods: From April 1993 to December 1993 15 CFRP non-cemented hip prostheses have been implanted. In a prospective clinical study plane radiographs, CT and MRT have been analysed. Results: Three stems were revised (1 femoral fracture, 1 severe thigh pain, 1 aseptic loosening). CFRP are not visible in plane radiographs. There was a complete (two-third of the cases) or nearly complete (one-third of the cases) small sclerotic interface between the prosthesis and the bone, these were apparent in CT and MRT in stable implant cases and did not have any clinical correlations. Discussion: The small sclerotic interface is quite different in comparison to so ...
International Nuclear Information System (INIS)
Research was conducted at Pacific Northwest Laboratory to develop high photosensitivity adaptive optical elements utilizing ion implanted lanthanum-doped lead-zirconate-titanate (PLZT). One centimeter square samples were prepared by implanting ferroelectric and anti-ferroelectric PLZT with a variety of species or combinations of species. These included Ne, O, Ni, Ne/Cr, Ne/Al, Ne/Ni, Ne/O, and Ni/O, at a variety of energies and fluences. An indium-tin oxide (ITO) electrode coating was designed to give a balance of high conductivity and optical transmission at near uv to near ir wavelengths. Samples were characterized for photosensitivity; implanted layer thickness, index of refraction, and density; electrode (ITO) conductivity; and in some cases, residual stress curvature. Thin film anti-ferroelectric PLZT was deposited in a preliminary experiment. The structure was amorphous with x-ray diffraction showing the beginnings of ...
The biocompatibility and corrosion resistance of various materials for use as sacrificial anodes in in vivo hybrid fuel cells were studied. Aluminium, zinc, and magnesium alloy AZ31B were studied, and the results are discussed.
1974-01-01
Comparison and co-relation of invasive and noninvasive methods of ejection fraction measurement.
UK PubMed Central (United Kingdom)
BACKGROUND: Accurate estimation of left ventricular ejection fraction (LVEF) has assumed great significance in the era of automatic implantable cardioverter defibrillators (AICDs), and a low EF may...Full Text Available
2007-11-01
CoSi_2 nanostructures by writing FIB ion beam synthesis
International Nuclear Information System (INIS)
A mass separated focused ion beam (FIB) is a very useful tool to fabricate nanostructures by writing implantation within an ion beam synthesis process. In these investigations the IMSA-OrsayPhysics FIB, equipped with a Co_3_6Nd_6_4 alloy liquid metal ion source, was applied. Si(100) and (111) wafers were implanted with 60 keV Co"+"+ ions in the dose range of 2 . 10"1"6 to 2 . 10"1"7 cm"-"2. Implantation parameters were investigated, like pixel dwell time, relaxation time (time between two cycles), dose rate as well as the pixel overlapping factor. The subsequent annealing was done in a two step process, namely 600 deg. C for 60 min and 1000 deg. C for 30 min in a N_2 ambient. The results obtained by SEM investigations in terms of continuous nanowire structures following the direction and interrupted CoSi_2 pattern in the direction show a clear dependence on the time scale as well as the scanning mode of the irradiation. ...
2006-07-01
Energy Technology Data Exchange (ETDEWEB)
The circulation in microvascularized rib grafts has been compared with that in conventional rib grafts and in those augmented by a direct vascular bundle implantation into the bone grafts. A new experimental model has been designed to correlate vascular perfusion, bone scan patterns, tetracycline labeling, and histological findings in these bone grafts. Posterior microvascularized rib grafts were found to have a circulatory pattern identical to that of the normal rib. Failed microvascularized rib grafts were revascularized more slowly than conventional rib grafts. Vascular bundles implanted into rib grafts remained patent and increased the rate of revascularization. The stripping or preservation of periosteum had no observable effects on the rate or pattern of conventional rib graft revascularization. The circulation in rib grafts was accurately reflected in technetium 99 bone scans, as was the patency of the anastomoses of microvascularized ...
1984-11-01
Energy Technology Data Exchange (ETDEWEB)
The effect of the nitrogen uptake in {alpha}-iron upon spark erosion in gaseous and liquid ammonia, plasma nitriding, and plasma immersion ion implantation is studied. The resulting phases and hyperfine parameters, measured by the Moessbauer spectroscopy, are discussed from the point of view of initial conditions of their preparation and subsequent heat and/or mechanical treatment. Spark erosion in the ammonia gas produces fine particles with the dominating ferromagnetic {alpha}-Fe phase (50%). The 20% of specimen volume form {alpha}'-Fe and {alpha}''-Fe{sub 16}N{sub 2} phases. The last 30% occupy the {gamma}'-Fe{sub 4}N, ferro- and paramagnetic {epsilon} phases, and {gamma}-Fe(N). Nitriding in the liquid ammonia allows to incorporate the higher content of nitrogen into {alpha}-iron particles which results in the formation of paramagnetic {epsilon}({zeta})-Fe{sub 2}N phase. This phase also dominates the surface of {alpha}-iron ...
2001-09-01
International Nuclear Information System (INIS)
The effect of the nitrogen uptake in #alpha#-iron upon spark erosion in gaseous and liquid ammonia, plasma nitriding, and plasma immersion ion implantation is studied. The resulting phases and hyperfine parameters, measured by the Moessbauer spectroscopy, are discussed from the point of view of initial conditions of their preparation and subsequent heat and/or mechanical treatment. Spark erosion in the ammonia gas produces fine particles with the dominating ferromagnetic #alpha#-Fe phase (50%). The 20% of specimen volume form #alpha#'-Fe and #alpha#''-Fe_1_6N_2 phases. The last 30% occupy the #gamma#'-Fe_4N, ferro- and paramagnetic #epsilon# phases, and #gamma#-Fe(N). Nitriding in the liquid ammonia allows to incorporate the higher content of nitrogen into #alpha#-iron particles which results in the formation of paramagnetic #epsilon#(#zeta#)-Fe_2N phase. This phase also dominates the surface of #alpha#-iron specimen implanted by nitrogen using ...
2001-09-01
UK PubMed Central (United Kingdom)
PurposeThe aim of this study was to evaluate 3.5 years-cumulative survival rate of implants placed on augmented sinus using Osteon, a bone graft material, and to assess the height...Full Text Available
2011-04-01
Case Reports: Fractures of Threaded Cups: Rare Complications of a Well-established Implant
UK PubMed Central (United Kingdom)
The use of cementless threaded cups in THA is a well-established treatment. Fractures of the cups are rare complications recorded in individual cases with material defects being discussed as the primary...Full Text Available
2009-03-01
Boron-enhanced diffusion of boron from ultralow-energy ion implantation
Energy Technology Data Exchange (ETDEWEB)
We have investigated the diffusion enhancement mechanism of boron-enhanced diffusion (BED), wherein boron diffusivity is enhanced four to five times over the equilibrium diffusivity at 1050&hthinsp;{degree}C in the proximity of a silicon layer containing a high boron concentration. It is demonstrated that BED is driven by excess interstitials injected from the high boron concentration layer during annealing. For evaporated layers, BED is observed above a threshold boron concentration between 1{percent} and 10{percent}, though it appears to be closer to 1{percent} for B-implanted layers. For sub-keV B implants above the threshold, BED dominates over the contribution from transient-enhanced diffusion to junction depth. For 0.5 keV B, this threshold implantation dose lies between 3{times}10{sup 14} and 1{times}10{sup 15} cm{sup {minus}2}. It is proposed that the excess interstitials responsible for BED are produced during ...
1999-04-01
Boron-enhanced diffusion of boron from ultralow-energy ion implantation
International Nuclear Information System (INIS)
We have investigated the diffusion enhancement mechanism of boron-enhanced diffusion (BED), wherein boron diffusivity is enhanced four to five times over the equilibrium diffusivity at 1050 ampersand hthinsp;degree C in the proximity of a silicon layer containing a high boron concentration. It is demonstrated that BED is driven by excess interstitials injected from the high boron concentration layer during annealing. For evaporated layers, BED is observed above a threshold boron concentration between 1% and 10%, though it appears to be closer to 1% for B-implanted layers. For sub-keV B implants above the threshold, BED dominates over the contribution from transient-enhanced diffusion to junction depth. For 0.5 keV B, this threshold implantation dose lies between 3x10"1"4 and 1x10"1"5 cm"-"2. It is proposed that the excess interstitials responsible for BED are produced during the formation of a silicon boride phase in the ...
1999-04-01
Energy Technology Data Exchange (ETDEWEB)
A new atomistic approach to Si device process simulation is presented. It is based on a Monte Carlo diffusion code coupled to a binary collision program. Besides diffusion, the simulation includes recombination of vacancies and interstitials, clustering and re-emission from the clusters, and trapping of interstitials. We discuss the simulation of a typical room-temperature implant at 40 keV, 5{times}10{sup 13} cm{sup {minus}2} Si into (001)Si, followed by a high temperature (815{degree}C) anneal. The damage evolves into an excess of interstitials in the form of extended defects and with a total number close to the implanted dose. This result explains the success of the {open_quote}{open_quote}+1{close_quote}{close_quote} model, used to simulate transient diffusion of dopants after ion implantation. It is also in agreement with recent transmission electron microscopy observations of the number of interstitials stored in ...
1996-01-01
International Nuclear Information System (INIS)
A new atomistic approach to Si device process simulation is presented. It is based on a Monte Carlo diffusion code coupled to a binary collision program. Besides diffusion, the simulation includes recombination of vacancies and interstitials, clustering and re-emission from the clusters, and trapping of interstitials. We discuss the simulation of a typical room-temperature implant at 40 keV, 5x10"1"3 cm"-"2 Si into (001)Si, followed by a high temperature (815 degree C) anneal. The damage evolves into an excess of interstitials in the form of extended defects and with a total number close to the implanted dose. This result explains the success of the open-quote open-quote+1 close-quote close-quote model, used to simulate transient diffusion of dopants after ion implantation. It is also in agreement with recent transmission electron microscopy observations of the number of interstitials stored in (311) defects. copyright 1996 ...
Annealing behavior of radiation damages in metal-silicides
International Nuclear Information System (INIS)
The annealing behavior of the radiation damage in epitaxial Pd_2Si and NiSi_2 films on Si, due to the implantation of 100 keV Ar ions, is investigated by using the channeling technique with "4He ions. (U.K.).
Toward a predictive atomistic model of ion implantation and dopant diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
We review the development and application of kinetic Monte Carlo simulations to investigate defect and dopant diffusion in ion implanted silicon. In these type of Monte Carlo models, defects and dopants are treated at the atomic scale, and move according to reaction rates given as input principles. These input parameters can be obtained from first principles calculations and/or empirical molecular dynamics simulations, or can be extracted from fits to experimental data. Time and length scales differing several orders of magnitude can be followed with this method, allowing for direct comparison with experiments. The different approaches are explained and some results presented.
1998-09-18
Reduced boron diffusion under interstitial injection in fluorine implanted silicon
International Nuclear Information System (INIS)
Point defect injection studies are performed to investigate how fluorine implantation influences the diffusion of boron marker layers in both the vacancy-rich and interstitial-rich regions of the fluorine damage profile. A 185 keV, 2.3x10"1"5 cm"-"2 F"+ implant is made into silicon samples containing multiple boron marker layers and rapid thermal annealing is performed at 1000 deg. C for times of 15-120 s. The boron and fluorine profiles are characterized by secondary ion mass spectroscopy and the defect structures by transmission electron microscopy (TEM). Fluorine implanted samples surprisingly show less boron diffusion under interstitial injection than those under inert anneal. This effect is particularly noticeable for boron marker layers located in the interstitial-rich region of the fluorine damage profile and for short anneal times (15 s). TEM images show a band of dislocation loops around the range of the fluorine ...
2007-12-01
Randomization of heavily damaged regions in annealed low energy Ge{sup +}-implanted (0 0 1)Si
Energy Technology Data Exchange (ETDEWEB)
Apparent growth of amorphous layers during low temperature annealing was observed in low energy Ge{sup +}-implanted (0 0 1)Si by high-resolution transmission electron microscopy. The occurrence of abnormal growth is due to the randomization of heavily damaged regions beneath the original amorphous/crystalline interfaces. The randomization process is attributed to the strain, incurred by the presence of a high density of large Ge atoms in the heavily damaged Si substrate, relaxation to lower the free energy of the systems. The randomization upon annealing may be fruitfully applied to minimize the transient enhanced diffusion in shallow junction formation.
2004-01-15
Randomization of heavily damaged regions in annealed low energy Ge"+-implanted (0 0 1)Si
International Nuclear Information System (INIS)
Apparent growth of amorphous layers during low temperature annealing was observed in low energy Ge"+-implanted (0 0 1)Si by high-resolution transmission electron microscopy. The occurrence of abnormal growth is due to the randomization of heavily damaged regions beneath the original amorphous/crystalline interfaces. The randomization process is attributed to the strain, incurred by the presence of a high density of large Ge atoms in the heavily damaged Si substrate, relaxation to lower the free energy of the systems. The randomization upon annealing may be fruitfully applied to minimize the transient enhanced diffusion in shallow junction formation.
2004-01-01
Plasma source ion implantation of ammonia into electroplated chromium
Energy Technology Data Exchange (ETDEWEB)
Ammonia gas (NH{sub 3}) has been used as a nitrogen source for plasma source ion implantation processing of electroplated chromium. No evidence was found of increased hydrogen concentrations in the bulk material, implying that ammonia can be used without risking hydrogen embrittlement. The retained nitrogen dose of 2.1 {times} 10{sup 17} N-at/cm{sup 2} is sufficient to increase the surface hardness of electroplated Cr by 24% and decrease the wear rate by a factor of 4.
1995-02-01
Low temperature proton irradiation of amorphous Pd/sub 80/Si/sub 20/ prepared by ion implantation
Energy Technology Data Exchange (ETDEWEB)
The damage induced by low-temperature proton irradiation in amorphous Pd/sub 80/Si/sub 20/ prepared by ion implantation is studied via electrical resistivity measurements. Our experimental results concerning the initial damage rate and the resistivity saturation are compared to the results obtained for electron and high energy /sup 16/O irradiation of amorphous Pd/sub 80/Si/sub 20/ quenched from the melt. The resistivity curve is analyzed in terms of irradiation-induced point defects.
1984-05-01
Implantation of single-impurity Fe and its magnetic coupling in Er studied by TDPAD
Energy Technology Data Exchange (ETDEWEB)
Single Fe impurities were implanted in an Er single crystal and found to occupy both substitutional and interstitial sites, below a temperature of 200 K. The local susceptibility of Fe on both sites follows a Curie-Weiss law and exhibits a positive local Curie constant, indicating an antiferromagnetic coupling between the Fe and the surrounding Er moments. The corresponding nuclear spin relaxation rates follow a Korringa law as a function of temperature, confirming the dominance of local magnetism and the formation of local moments on each of the sites occupied by Fe.
2004-05-01
International Nuclear Information System (INIS)
The aim of this work is the implantation and characterization of a neutron radiography system that uses an electronic device for attainment of images in real time, for its implementation in the nuclear research reactor Argonauta at IEN/CNEN (Nuclear Engineering Institute of the Brazilian Nuclear Energy Commission). The Electronic Imaging System in Real Time is composed by a scintillator screen for neutron, a video camera (CCD), a digital plate and a computer with specific computational programs for digital processing of the images. The System in installed real time is apt to carry through neutron radiography inspections of static and dynamic events of several types of samples. (author)
2004-04-01
Free electron laser (FEL) annealing of diamond
International Nuclear Information System (INIS)
Free Electron Laser (FEL) with wide wavelength tunability has been developed and used for various applications. We report the structural-changes in P-ion-implanted diamond when we can achieve resonant excitation of the vibrations of specific bonds in the lattice of target (P-C) by using FEL. The change of property was analyzed by SIMS and Raman spectroscopy. After 5.8 #mu#m-FEL irradiation, we observed the crystallization of amorphous structure which was induced by P-ion-implantation. These results indicated the FEL annealing of diamond at room temperature. (Copyright (c) 1998 Elsevier Science B.V., Amsterdam. All rights reserved.)
1998-09-02
Effects of avalanche hole injection in fluorinated SiO[sub 2] MOS capacitors
Energy Technology Data Exchange (ETDEWEB)
Significantly improved immunity to hot-hole damage of the SiO[sub 2]/Si structure is achieved by a shallow fluorine implantation into the poly-Si gate of MOS capacitors followed by a drive-in process. Compared to the nonfluorinated control, the fluorinated samples exhibit a dramatic reduction of both hole trapping probability and interface-trap generation under avalanche hole injection conditions. The degree of such an improvement increases monotonically as a function of the F implantation dose (up to 10[sup 16]/cm[sup 2]). Significant decrease of the hole detrapping rate is also observed in fluorinated samples. Possible mechanisms are discussed.
1993-04-01
Dextranomer/hyaluronic acid copolymer (Deflux) implants mimicking distal ureteral calculi on CT
Energy Technology Data Exchange (ETDEWEB)
Periureteral or subtrigonal injection of dextranomer/hyaluronic acid (Dx/HA) copolymer (Deflux, Q-Med, Uppsala, Sweden) is an increasingly common endoscopic treatment for vesicoureteral reflux. We report a confusing radiographic finding of bilateral calcified Dx/HA injections initially thought to represent bilateral distal ureteral stones in a boy who presented with intermittent periumbilical pain. Urologists, radiologists, and emergency room physicians should be aware of the potential for calcification of ureteral implants of Dx/HA, and of the potentially confusing radiographic images that may result. (orig.)
2008-01-15
Plasma-based ion implantation and deposition: A review of physics,technology, and applications
Energy Technology Data Exchange (ETDEWEB)
After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and ...
2005-05-16
Defect engineering via ion implantation to control B diffusion in Si
International Nuclear Information System (INIS)
The processes which are currently studied in the fabrication of B-doped ultra shallow junctions (USJ) usually involve a preamorphization step to reduce B channelling effect during implantation and to improve B electrical activation. At this stage a high amount of Si interstitial atoms (Is), which dramatically increases the B diffusivity, is introduced. The introduction of voids in Si is a promising tool to control B transient enhanced diffusion (TED), because of their ability to capture Is. In this work the efficiency of a cavity band to reduce B TED is checked in silicon interstitial supersaturation conditions, obtained by high dose Si implantation. He is implanted either at 10 keV or at 50 keV with a fluence of 5 x 10"1"6 cm"-"2. Conventional techniques to introduce and activate the B (conventional ion implantation and rapid thermal annealing (RTA)) are applied in order to have a better control of the ...
2009-03-15
Energy Technology Data Exchange (ETDEWEB)
A number of screening tests were performed to determine ion species that effectively reduce wear rates when implanted in four industrial steels. Ball bearing steel 100Cr6 (AISI 52100) showed a wear rate reduction by a factor of 20 when implanted with carbon dioxide to a dose of 5x10{sup 17} cm{sup -2} with a non-mass-separated ion beam and by a factor of {>=}20 when implanted with 5x10{sup 17} cm{sup -2} oxygen ions. For the ferritic and martensite steels X90CrMoV18 (AISI 440B, unhardened and hardened) also a strong wear reduction after implantation of oxygen ions was found. Co-implantation of aluminum and oxygen also reduces wear rates of X90CrMoV18, of S6-5-2 (AISI M2), and of 100Cr6, respectively. For comparison, thin oxide layers were grown in a low-temperature thermal oxidation process. These experiments also yielded reduced wear rates by a factor of 10. The surfaces were ...
1991-07-01
Energy Technology Data Exchange (ETDEWEB)
The influence of substrate temperature on both the implantation and post-annealing characteristics of molecular-ion-implanted 5 x 10{sup 14} cm{sup -2} 77 keV BSi in silicon was investigated in terms of boron depth profiles and damage microstructures. The substrate temperatures under investigation consisted of room temperature (RT) and liquid nitrogen temperature (LT). Post-annealing treatments were performed using rapid thermal annealing (RTA) at 1050 deg, C for 25 s. Boron depth profiles and damage microstructures in both the as-implanted and as-annealed specimens were determined using secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM), respectively. The as-implanted results revealed that, compared to the RT specimen, the LT specimen yields a shallower boron depth profile with a reduced tail into the bulk. An amorphous layer containing a smooth amorphous-to-crystalline ...
2007-08-15
Energy Technology Data Exchange (ETDEWEB)
At the Huizhou oil field in China the FPSO Munin of Bluewater completely relies on five computer controlled propulsion screws to position itself, a so-called Dynamic Positioning (DP) system. In this article report is given of training given to the crew of the FPSO Munin. A floating production, storage and offloading (FPSO) unit is a floating vessel used by the offshore industry for the processing and storage of oil and gas. [Dutch] Op het Huizhou oileveld in China vertrouwt de FPSO (floating production, storage and offloading unit) Munin van Bluewater uitsluitend op een vijftal computergestuurde voorstuwingsschroeven om zichzelf in positie te houden, een zogenaamd Dynamisch Positionering (DP) systeem. In dit artikel wordt verslag gedaan van en uitleg gegeven over trainingen die zijn gegeven aan de bemanning van de FPSO Munin.
2010-07-15
Solidification of DOE problem wastes
Energy Technology Data Exchange (ETDEWEB)
Sodium nitrate waste has been successfully solidified in two types of polymeric materials: polyethylene, a thermoplastic material, and polyester styrene (PES), a thermosetting material. Waste form property evaluation tests such as ANS 16.1 leaching test and compressive strength measurements were performed on the waste forms containing various amounts of sodium nitrate. A single-screw extruder was employed for incorporating dry waste into polyethylene at its melt temperature of 120/sup 0/C to produce a homogenous mixture. Results of the leaching test for polyethylene waste forms containing 30, 50, 60 and 70 wt% sodium nitrate are presented as cumulative fraction leached and leaching indices ranging from 11 to 7.8. Two PES systems are discussed. The first is for solidification of dry salt wastes and the second is a water extendible system that is compatible with wet waste streams. Leaching data for PES and water extendible PES waste forms containing 30 wt% sodium ...
1986-01-01
Energy Technology Data Exchange (ETDEWEB)
This work deals with a new route to modify polymer blend morphology in order to improve the porosity of gas diffusion layers (GDLs) for proton exchange membrane fuel cells (PEMFCs). First, electrically conductive polymer-based blends were carefully formulated using a twin-screw extrusion process. Blend electrical conductivity was ensured by the addition of high specific surface area carbon black and synthetic graphite flakes. Final GDL porosity, in particular its macroporosity, was generated by melt blending polyamide 11 (PA11) matrix with polystyrene (PS) followed by PS extraction with tetrahydrofuran (THF) solvent at room temperature. In order to improve GDL porosity by the optimisation of PS dispersion in the PA11 matrix, PA11/PS blends were compatibilised by the addition of 2 wt.-% of clay. It was observed that both macroporosity and pore size distribution were beneficially modified after blend compatibilisation. Final GDL conductivity of about 1.25 S cm{sup ...
2007-12-15
Point and transfer mobility of point-connected ribbed plates
The work reported in this paper addresses the problem of structure-borne sound transmission between vibrating sources and ribbed-plate receiver structures. Vibrating sources, such as pumps, motors, fans, etc., transmit vibro-acoustic power, causing noise complaints by occupants in cars, trains, aircraft, buildings and/or material fatigue and damage. The transmission process is complicated in that sources transmit power through several contacts and by up to six components of excitation at each contact. The structure-borne sound power is a function of source activity, source mobility and receiver mobility, and all three quantities must be known to some degree. For non-homogeneous receiver structures, such as thin-plate cavity constructions or lightweight framed constructions, the sheathing plates are typically fastened to the framing members using bolts, screws or spot-welded joints. Hence the resulting system is a point-connected ribbed plate structure and the ...
2011-09-01
Low field magnetic resonance imaging of femoral neck fractures
International Nuclear Information System (INIS)
Fourteen patients with cervical hip fractures were treated with internal fixation using titanium screws. The femoral head vitality was evaluated with "9"9Tc"m-MDP scintigraphy and scintimetry within 2 weeks postoperatively and by serial low field magnetic resonance imaging (MR). Two patients with reduced radionuclide uptake (femoral head ratio =# 1.0), MR revealed a focal decrease of the signal intensity in the femoral head or neck at 2, 3 and 7 months after fracture, respectively. The radiographs in one of these patients were normal at 7 months after fracture. The second one showed signs of necrosis at 16 months and the last one developed delayed/non-union. With a non-ferromagnetic osteosynthesis the healing course after femoral neck fracture can be studied with low field MR equipment without disturbing artifacts. The time period between ischaemia and definite abnormalities on MR may embrace several months. (orig.).
Extrusion as a thermo-mechanical pre-treatment for lignocellulosic ethanol
Energy Technology Data Exchange (ETDEWEB)
Two physical pre-treatment methods, particle size reduction by grinding and thermo-mechanical extrusion, were evaluated as alternatives to traditional biomass pretreatments for lignocellulosic ethanol. Commonly available agricultural co-products wheat bran and soybean hull were the model substrates. Extrusion led to higher reducing sugar yields as compared to grinding for wheat bran, but not in the case of soybean hulls. The best combination of extrusion screw speed and maximum barrel temperature were 7 Hz/150 C and 3.7 Hz/110 C. The use of a solvent mixture (sodium hydroxide, urea, and thiourea) and calcium chloride solution in combination with extrusion treatment did not lead to improvement in reducing sugar yield. However, extensive washing to get rid of solvents and enzymatic inhibitors improved the conversion efficiency substantially, resulting in total reducing sugar yields of 60-73% and 25-36%, respectively, for wheat bran and soybean hull. (author)
2010-12-15
Different purification methods and quality of sunflower biodiesel
Energy Technology Data Exchange (ETDEWEB)
Biodiesel is derived from triacylglycerides and is produced primarily through transesterification, a chemical reaction of vegetable oils with alcohol, methanol or ethanol. The cost of raw material should be considered since 85 per cent of production cost is related to vegetable oil. The purpose of this study was to evaluate oil expression of sunflower seed. It also examined the sunflower crude oil as a raw material for biodiesel by transesterification in both laboratory and pilot scale studies. Three different biodiesel purification methods were examined. The best result for oil expelling (68.4 per cent) at the experimental stage was obtained for seeds with a moisture content of 6.9 per cent at 25 degrees C and at a screw speed of 114 rpm. For biodiesel production at the laboratory scale, the best result for oil expelling was 87.5 per cent. It was obtained with an ethanol:oil molar ratio of 4.7:1 and with a 4.42 per cent catalyst concentration related to the ...
2010-07-01
Energy Technology Data Exchange (ETDEWEB)
In the present study, the type and densities of defects in AlN crystals grown on 6H-SiC seeds by the sublimation-recombination method were assessed. The positions of the defects in AlN were first identified by defect selective etching (DSE) in molten NaOH-KOH at 400 C for 2 minutes. Etching produced pits of three different sizes: 1.77 m, 2.35 m , and 2.86 m. The etch pits were either aligned together forming a sub-grain boundary or randomly distributed. The smaller etch pits were either isolated or associated with larger etch pits. After preparing crosssections of the pits by the focused ion beam (FIB) technique, transmission electron microscopy (TEM) was performed to determine which dislocation type (edge, mixed or screw) produced a specific etch pit sizes. Preliminary TEM bright field and dark field study using different zone axes and diffraction vectors indicates an edge dislocation with a Burgers vector 1/3[1120] is associated with the smallest etch pit size.
2008-03-01
Coal liquefaction research. Semiannual report, October 1983-March 1984
Energy Technology Data Exchange (ETDEWEB)
This semiannual report for the period October 1983-March 1984 summarizes activities in Sandia National Laboratories' continuing program of coal liquefaction research. The primary goals are to: explore novel catalytic concepts and materials for conversion of coal to liquid fuels; determine the effects of process variables on catalyst deactivation; determine the effects of coal structure and solvent properties on low temperature dissolution; study the kinetics and catalysis of hydrogen transfer reactions; develop an understanding of slurry gelling phenomena; and provide a technical assessment of coal liquefaction processes. During this period, work was performed on: the use of pyrene as a chemical probe of catalyst activity; analysis of catalysts from Wilsonville run 242 using ESCA; atmospheric pressure model compound activity testing of regenerated catalysts from Wilsonville run 242; base displacement experiments with a coal-indole complex; preliminary hydrogenation tests with ...
1985-08-01
Coal liquefaction research. Quarterly report, April-June 1984
Energy Technology Data Exchange (ETDEWEB)
This quarterly report for the period April through June 1984 summarizes activities in Sandia National Laboratories' continuing program of coal liquefaction research. The primary goals are to: explore novel catalytic concepts and materials for conversion of coal to liquid fuels; determine the effects of process variables on catalyst deactivation; determine the effects of coal structure and solvent properties on low temperature dissolution; study the kinetics and catalysis of hydrogen transfer reactions; develop an understanding of slurry gelling phenomena; and provide a technical assessment of coal liquefaction processes. During this period, work was performed on: analysis of catalyst samples from Wilsonville Run 246; catalyst presulfiding; catalyst activity testing using pyrene as a chemical probe; catalyst deactivation using a high-pressure model compound test reactor; dissolution chemistry of Wyodak coal; slurry gelling utilizing the helical screw ...
1984-08-01
Updated user's guide for SAMMY: multilevel R-matrix fits to neutron data using Bayes' equation
International Nuclear Information System (INIS)
In 1980 the multilevel multichannel R-matrix code SAMMY was released for use in analysis of neutron data at the Oak Ridge Electron Linear Accelerator. Since that time, SAMMY has undergone significant modifications: (1) User-friendly options have been incorporated to streamline common operations and to protect a run from common user errors, (2) The Reich-Moore formalism has been extended to include an optional logarithmic parameterization of the external R-matrix, for which any or all parameters may be varied, (3) the ability to vary sample thickness, effective temperature, matching radius, and/or resolution-broadening parameters has been incorporated, (4) to avoid loss of information (i.e. computer round-off errors) between runs, the ''covariance file'' now includes precise values for al variables, (5) Unused but correlated variables may be included in the analysis. Because of these and earlier changes, the 1980 SAMMY manual is now hopelessly obsolete. This report is intended to be ...
Three-dimensional power system stabilizer
Energy Technology Data Exchange (ETDEWEB)
Power system stabilizers (PSSs) are used to enhance damping of power system oscillations through excitation control of synchronous generator. The objective of the PSS is to generate a stabilizing signal, which produces a damping torque component on the generator shaft. Conventional PSSs are designed with the phase compensation technique in the frequency domain and include the lead-lag blocks whose parameters are determined according to a linearized power system model. The performance of conventional PSSs (CPSSs) depends upon the generator operating point and the system parameters, but a reasonable level of robustness can be achieved depending on the tuning method. This paper presents a new three-dimensional PSS (3D PSS), which uses rotor speed deviation, rotor acceleration and load angle deviation as input signals. The 3D PSS attempts to return the generator to the state-space origin, based on the generator's trajectory in state-space and the achievement ...
2010-07-15
Swift panchromatic observations of the bright gamma-ray burst GRB050525a
The bright gamma-ray burst GRB050525a has been detected with the Swift observatory, providing unique multiwavelength coverage from the very earliest phases of the burst. The X-ray and optical/UV afterglow decay light curves both exhibit a steeper slope ~0.15 days after the burst, indicative of a jet break. The timing of the jet break combined with the total gamma-ray energy of the burst constrains the opening angle of the jet to be 2.5 degrees. We derive an empirical `time-lag' redshift from the BAT data of z_hat = 0.69 +/- 0.02, in good agreement with the spectroscopic redshift of 0.61. Prior to the jet break, the X-ray data can be modelled by a simple power law with index alpha = -1.2. However after 300s the X-ray flux brightens by about 30% compared to the power-law fit. The optical/UV data have a more complex decay, with evidence of a rapidly falling reverse shock component that dominates in the first minute or so, giving way to a flatter forward shock ...
2006-01-01
Suzaku and Optical Spectroscopic Observations of SS 433 in the 2006 April Multiwavelength Campaign
We report results of the 2006 April multi-wavelengths campaign of SS 433, focusing on X-ray data observed with Suzaku at two orbital phases (in- and out-of- eclipse) and simultaneous optical spectroscopic observations. By analyzing the Fe25 K_alpha lines originating from the jets, we detect rapid variability of the Doppler shifts, dz/dt ~ 0.019/0.33 day^-1, which is larger than those expected from the precession and/or nodding motion. This phenomenon probably corresponding to "jitter" motions observed for the first time in X-rays, for which significant variability both in the jet angle and intrinsic speed is required. From the time lag of optical Doppler curves from those of X-rays, we estimate the distance of the optical jets from the base to be ~(3-4) \\times 10^14 cm. Based on the radiatively cooling jet model, we determine the innermost temperature of the jets to be T_0 = 13 +/- 2 keV and 16 +/- 3 keV (the average of the blue and red jets) for the ...
2010-01-01
Study of exhaust and noise emissions reduction on a single spray direct injection diesel engine
Energy Technology Data Exchange (ETDEWEB)
In order to materialize the automobile use small direct injection diesel engine (DI), the reduction in both exhaust emission and noise, as studied, was explained in summary. The DI, as excellent in fuel consumption characteristics, was studied to be adopted to the small automobile, with the materialization of small DI to be about 600cc in capacity per cylinder. However the further diminution in dimension had not been materialized yet, because of the aggravation in exhaust emission and vibration noise. Then a single spray DI, characterized by the approximate sphericity in shape of combustion chamber and adoption of cast iron made piston and two-stage spring nozzle, was prototypically made, with optimizing the combustion in characteristics, decreasing HC in exhaust quantity by modifying the injection system, doing also NOx in exhaust quantity by adopting the lag angle at injection time and EGR, modifying the structure to lower the noise, and adopting an air heater to ...
1989-04-01
This study explored adolescents' sexual self-disclosure in real life and cyberspace, as well as gender differences of sexual self-disclosure in cyberspace. There were 115 male and 92 female adolescents who participated in this pretest and posttest survey. In general, the depth of sexual self-disclosure in real life was greater than in cyberspace, but the breadth of sexual selfdisclosure in both real life and cyberspace was equivalent. The cross-lagged panel analysis indicated that adolescents who were willing to self-disclose sexual topics in real life also selfdisclosed them more in cyberspace, and vice versa. Furthermore, sexual self-disclosure in both disclosing environments was mutually predicted by each other. The findings also indicated that cyberspace might not be a substitute channel of compensatory gratification for sexual self-disclosure in real life. As for gender differences, the breadth and depth of sexual self-disclosure in male adolescents were ...
2006-02-01
Salivary cortisol assessment in the evaluation of hypothalamic-pituitary-adrenal function
International Nuclear Information System (INIS)
A simple, short and sensitive direct radio-immunoassay technique for the determination of salivary cortisol concentration was employed to assess saliva as a medium for evaluating cortisol response during endocrine testing in 9 controls and 40 patients. Results in controls suggested that an adequate salivary cortisol response to insulin hypoglycaemia was an increase of 150% above the basal value with a minimum peak of 15 nmol/l. Thirty-three patients were classified as being either good or poor responders to insulin hypoglycaemia on the basis of criteria for plasma cortisol levels. When the defined salivary cortisol response was used for assessment, all 33 patients were correctly categorized into the same response groups. The salivary cortisol response to intramuscular tetracosactin in 3 patients and an intravenous dexamethasone infusion in 4 patients confirmed the value of saliva as an assay medium. These studies show that the salivary cortisol response parallels that of total plasma ...
1984-05-01
RESOLVING DOPPLER-FACTOR CRISIS IN ACTIVE GALACTIC NUCLEI: NON-STEADY MAGNETIZED OUTFLOWS
International Nuclear Information System (INIS)
Magnetically driven non-stationary acceleration of jets in active galactic nuclei results in the leading parts of the flow being accelerated to much higher Lorentz factors than in the case of steady-state acceleration with the same parameters. The higher Doppler-boosted parts of the flow may dominate the high-energy emission of blazar jets. We suggest that highly variable GeV and TeV emission in blazars is produced by the faster moving leading edges of highly magnetized non-stationary ejection blobs, while the radio data trace the slower-moving bulk flow. Thus, the radio and gamma-ray emission regions have different, but correlated, Doppler factors. High-energy emission is generated, typically within the optically thick core, in the outer parts of the broad-line emission region, avoiding the radiative drag on the faster parts of the flow. The radio emission should correlate with the gamma-ray emission, delayed with frequency-dependent time lag of the order of weeks ...
2010-10-10
In longitudinal and spatial studies, observations often demonstrate strong correlations that are stationary in time or distance lags, and the times or locations of these data being sampled may not be homogeneous. We propose a nonparametric estimator of the correlation function in such data, using kernel methods. We develop a pointwise asymptotic normal distribution for the proposed estimator, when the number of subjects is fixed and the number of vectors or functions within each subject goes to infinity. Based on the asymptotic theory, we propose a weighted block bootstrapping method for making inferences about the correlation function, where the weights account for the inhomogeneity of the distribution of the times or locations. The method is applied to a data set from a colon carcinogenesis study, in which colonic crypts were sampled from a piece of colon segment from each of the 12 rats in the experiment and the expression level of p27, an important cell cycle ...
2007-01-01
Multiple Ion Exchange Column Tests for Technetium Removal from Hanford Tank Waste Supernate
Five cycles of loading, elution, and regeneration were performed to remove technetium from a Hanford waste sample retrieved from Tank 241-AW-101 using SuperLig 639 resin. The waste sample was diluted to 4.95 M Na plus and then was processed to remove 137Cs through dual ion exchange columns each containing 15 mL of SuperLig 644. To remove 99Tc, the cesium decontaminated solution was processed downwards through two ion exchange columns, each containing 12 mL of SuperLig 639 resin. The columns, designated as lead and lag, each had an inside diameter of 1.45 cm and a height of 30 cm. The columns were loaded in series, but were eluted and then regenerated separately. The average technetium loading for the cycles was 250 BV at 10 percent breakthrough. There was no significant difference in the loading performances among the five cycles. The percent removal of 99Tc was greater than 99.94 percent and the average decontamination factor (DF) was approximately 1.7 x 103. ...
2004-02-27
Measurement of the static magnetization of solid "3He through the ordering temperature
International Nuclear Information System (INIS)
The static magnetization of solid "3He contained in sintered copper was measured. The results of the density on the melting curve show that below 5 mK, the magnetization M rises above the Curie-Weiss law extrapolated from high temperature. It reaches a maximum of twice as much as the Curie Weiss law value at temperature Tm, which would be somewhat below 1.25 mK if the system could be warmed up at infinitesimally slow rate. Below Tm, M decreases rapidly to 0.4 of its maximum, then appears to become independent of temperature. The previously reported decrease of specific heat below the Curie-Weiss law value in the range below 4 mK is apparently related to the increase of M in that range. At the low temperature end, apparent decrease of M is due to the fact that there is background magnetization which is out of equilibrium with the thermometer when there is solid "3He in the sample cell. It is suspected that the background signal comes primarily from the nuclear magnetism of sintered ...
1977-09-09
International Nuclear Information System (INIS)
This study develops a statistical model of industrial US natural gas consumption based upon historical data for the 1958-2003 period. The model specifically addresses interfuel substitution possibilities and changes in the industrial economic base. Using a relatively simple approach, the framework can be simulated repeatedly with little effort over a range of different conditions. It may also provide a valuable input into larger modeling exercises where an organization wants to determine long-run natural gas prices based upon supply and demand conditions. Projections based upon this demand framework indicate that industrial natural gas consumption may grow more slowly over the next 20 yr than being projected by the U.S. Energy Information Administration (EIA). This conclusion is based upon the assumption that natural gas prices will follow oil prices, as they have done over recent decades. If natural gas prices should lag well below oil prices, as envisioned by the ...
2007-07-01
H{infinity} Control Synthesis for Power System Stabilizer Design using LMI Optimization Method
Energy Technology Data Exchange (ETDEWEB)
This paper presents the application of H{infinity} control synthesis using LMI optimization method to power system stabilizer(PSS) design. Since power system is usually operated under circumstance of unmeasurable uncertainties and external disturbances, the improvement of small signal stability becomes one of the most important issue for securing system stability and preventing low frequency oscillation phenomena. The LMI optimized H{infinity} PSS provides robust performance and guarantees the internal stability under these operating conditions. The global optimal H{infinity} norm is found using LMI convex optimization method which is more systematic than standard two Riccati solution method. The design results are simulated for a case study. We verified that the LMI method shown the best performance characteristic among standard Riccati method and conventional lead/lag method. (author). 19 refs., 12 figs., 3 tabs.
2000-04-01
The aim of present study was to evaluate antioxidant property of Glycyrrhiza glabra root extracts using in vitro models. The dose-dependent aqueous and ethanolic extracts demonstrated the scavenging activity against nitric oxide (concentration that caused 50% inhibition of nitric oxide radicals [IC(50)]=72 and 62.1 microg/ml, respectively), superoxide (IC(50)=64.2 and 38.4 microg/ml, respectively), hydroxyl (IC(50)=81.9 and 63 microg/ml, respectively), DPPH (IC(50)=43.6 and 28.3 microg/ml, respectively) and ABTS(*+) (IC(50)=77.3 and 57.2 microg/ml, respectively) radicals. Further, both extracts showed strong reducing power and iron-chelating capacities. In the Fe(2+)/ascorbate system, both extracts were found to inhibit mitochondrial fraction lipid peroxidation. In copper-catalyzed human serum and low-density lipoprotein oxidation models, both extracts significantly (P<0.05) lengthened the lag phase along with a decline in the oxidation rate, conjugated dienes, ...
2009-04-22
Binaries migrating in a gaseous disk: Where are the Galactic center binaries?
The massive stars in the Galactic center inner arcsecond share analogous properties with the so-called Hot Jupiters. Most of these young stars have highly eccentric orbits, and were probably not formed in-situ. It has been proposed that these stars acquired their current orbits from the tidal disruption of compact massive binaries scattered toward the proximity of the central supermassive black hole. Assuming a binary star formed in a thin gaseous disk beyond 0.1 pc from the central object, we investigate the relevance of disk-satellite interactions to harden the binding energy of the binary, and to drive its inward migration. A massive, equal-mass binary star is found to become more tightly wound as it migrates inwards toward the central black hole. The migration timescale is very similar to that of a single-star satellite of the same mass. The binary's hardening is caused by the formation of spiral tails lagging the stars inside the binary's Hill radius. We show ...
2010-01-01
British Library Electronic Table of Contents (United Kingdom)
Abstract A bacteriocin-producing Streptococcus bovis strain (HC5) outcompeted a sensitive strain (JB1) before it reached stationary phase (pH 6.4), even though it grew 10% slower and cell-free bovicin HC5 could not yet be detected. The success of bacteriocin-negative S. bovis isolates was enhanced by the presence of another sensitive bacterium (Clostridium sticklandii SR). PCR based on repetitive DNA sequences indicated that S. bovis HC5 was not simply transferring bacteriocin genes to S. bovis JB1. When the two S. bovis strains were coinoculated into minimal medium, bacteriocin-negative isolates predominated, and this effect could be explained by the longer lag time (0.5 vs. 1.5 h) of S. bovis HC5. If the glucose concentration of the minimal medium was increased from 2 to 7 mg mL-1, the e...
2006-01-01
Atmospheric emissions inventory data for heavy-duty vehicles
International Nuclear Information System (INIS)
Heavy-duty trucks and buses are substantial contributors to the atmospheric oxides of nitrogen (NO_x) inventory, but prediction of their emissions in real use remains inchoate. Continuous emissions of NO_x were recorded from Chassis dynamometer testing of eight vehicles using a variety of transient cycles, including the Central Business District schedule. NO_x data were treated to account for sampling time lag and presented against instantaneous vehicle axle power. Data were repeatable from run to run and test schedule, but vehicle type and test cycle both influenced the instantaneous emissions rates. However, the resulting correlations may be used for mobile source NO_x contribution estimation when combined with vehicle activity data. The emissions data were also presented as NO_x/CO_2, which are valuable for comparison with remote sensing emissions data. The overall average ratio for all of the data considered was 0.0141, which corresponds to an emissions ...
1999-01-01
Energy Technology Data Exchange (ETDEWEB)
The theory and application of the optimal control of linear systems to stabilize or improve the system stability is well known. For an optimal linear regulator design, the arbitrariness involved in the parameters of the cost function always affects the final control law and the closed-loop system poles which decide the system dynamic characteristics. A new approach, 'The inverse problem approach' has been developed to overcome this difficulty. The system so designed will have preassigned closed-loop poles and the resulting closed-loop system performance can be ensured. In this paper the inverse problem approach for optimal regulator design is applied to the power system stabilizer (PSS) design for single-machine infinite-bus systems. The results show that, as far as the linearized model is concerned, systems designed by the inverse problem approach have better closed-loop performance than those designed by the classical PSS design approach and a simple way of using a ...
1991-02-01
Aeroelastic Analysis of Rotor Blades Using Cfd/csd Coupling in Hover Mode
A computational fluid dynamics (CFD) is coupled with a computational structural dynamics (CSD) to simulate the unsteady rotor flow with aeroelasticity effects. An unstructured upwind Navier-Stokes solver was developed for this simulation, with 2nd order time-accurate dual-time stepping method for temporal discretization and low Mach number preconditioning method. For turbulent flows, both the Spalart-Allmaras and Menter's SST model are available. Mesh deformation is achieved through a fast dynamic grid method called Delaunay graph map method for unsteady flow simulation. The rotor blades are modeled as Hodges & Dowell's nonlinear beams coupled flap-lag-torsion. The rotorcraft computational structural dynamics code employs the 15-dof beam finite element formulation for modeling. The structure code was validated by comparing the natural frequencies of a rotor model with UMARC. The flow and structure codes are coupled tightly with information exchange several ...
2010-01-01
Activation of fat cell adenylate cyclase by protein kinase C
Energy Technology Data Exchange (ETDEWEB)
Purified protein kinase C (C-kinase) from guinea pig pancreas and rat brain stimulated adenylate cyclase activity in purified rat adipocyte membranes. Cyclase stimulation occurred over 100 to 1000 mU/ml of C-kinase activity, required greater than 10 ..mu..M calcium, proceeded without a lag, was not readily reversible, and required no exogenous phospholipid. Moreover, C-kinase inhibitors, such as chlorpromazine and palmitoyl carnitine, inhibited selectively adenylate cyclase which was activated by C-kinase and calcium. Depending on assay conditions, 10 nM 12-0-tetradecanoylphorbol-13-acetate (TPA) either enhanced or was required for kinase action on cyclase. Also, TPA plus calcium promoted the quantitative association of C-kinase with membranes. Adenylate cyclase activation by C-kinase was seen both in the presence and absence of exogenous GTP, indicating that the kinase effect does not result from an action on the GTP-binding, inhibitory regulatory component (N/sub ...
1986-05-01
Indicators of safety culture - selection and utilization of leading safety performance indicators
International Nuclear Information System (INIS)
Safety indicators play a role in providing information on organizational performance, motivating people to work on safety and increasing organizational potential for safety. The aim of this report is to provide an overview on leading safety indicators in the domain of nuclear safety. The report explains the distinction between lead and lag indicators and proposes a framework of three types of safety performance indicators - feedback, monitor and drive indicators. Finally the report provides guidance for nuclear energy organizations for selecting and interpreting safety indicators. It proposes the use of safety culture as a leading safety performance indicator and offers an example list of potential indicators in all three categories. The report concludes that monitor and drive indicators are so called lead indicators. Drive indicators are chosen priority areas of organizational safety activity. They are based on the underlying safety model and potential safety ...
2010-05-01
The effects of energy non-monochromaticity of "1"1B ion beams on "1"1B diffusion
International Nuclear Information System (INIS)
We have shown that energy contamination introduced by ion beam deceleration technology that is used to increase the beam currents available for low energy boron implants, can affect fabricated junctions adversely. A 4 keV "1"1B beam is extracted and retarded by a potential of -3.5 keV for 0.5 keV "1"1B implantation, or by a potential of -3.8 keV for 0.2 keV "1"1B implantation. Intentional beam contamination was introduced by turning off the retarding potential to allow the 4 keV "1"1B ions to irradiate Si wafers directly. The percentage of contamination, at levels of 0.1%, 0.2% and 0.3% was introduced. Rapid thermal annealing of all the implanted samples was performed under N_2 ambient at 1050 deg. C for 1 s. The dopant tail profiles themselves are not significant if the contamination levels are low. However, the much higher damage level coming from high energy contamination increases the transient ...
2005-08-01
Energy Technology Data Exchange (ETDEWEB)
The results of interstitial brachytherapy in 13 patients with malignant brain tumors (malignant glioma 9 cases, metastatic brain tumor 4 cases) were reported. In all patients, Ir-192 thin wires were implanted temporarily in afterloading catheters, which were implanted appropriately by means of MRI or CT guided stereotactic technique. Clinical results on CT scan were as follows: CR (complete response) 1 case, PR (partial response) 6 cases and NC (no change) 6 cases. Even in the NC group, tumor growth was inhibited temporarily. Tumor free intervals were ranged 2-17 months. In early series, the intervals were about 2 months due to incomplete arrangement of radioactive implants. In recent series, prolongation of tumor free interval more than 12 months was achieved due to precise arrangements of implants. MRI guided stereotactic interstitial brachytherapy may provide safe and precise intracranial ...
1990-05-01
Stereotactic iridium-192 interstitial brachytherapy for intracranial malignant tumors
International Nuclear Information System (INIS)
The results of interstitial brachytherapy in 13 patients with malignant brain tumors (malignant glioma 9 cases, metastatic brain tumor 4 cases) were reported. In all patients, Ir-192 thin wires were implanted temporarily in afterloading catheters, which were implanted appropriately by means of MRI or CT guided stereotactic technique. Clinical results on CT scan were as follows: CR (complete response) 1 case, PR (partial response) 6 cases and NC (no change) 6 cases. Even in the NC group, tumor growth was inhibited temporarily. Tumor free intervals were ranged 2-17 months. In early series, the intervals were about 2 months due to incomplete arrangement of radioactive implants. In recent series, prolongation of tumor free interval more than 12 months was achieved due to precise arrangements of implants. MRI guided stereotactic interstitial brachytherapy may provide safe and precise intracranial ...
1990-01-01
Si and Si/P implants in In{sub 0.5}Ga{sub 0.5}P and In{sub 0.5}Al{sub 0.5}P
Si and Si/P ion implantation doping of In{sub 0.5}Ga{sub 0.5}P and In{sub 0.5}Al{sub 0.5}P has been studied for several Si and P doses at energies of 90 and 100 keV, respectively. For single Si implants in InGaP a maximum Hall sheet electron concentration of 1.33{times}10{sup 13} cm{sup {minus}2} is achieved for a Si dose of 5{times}10{sup 13} cm{sup {minus}2}. When an optimum dose (2.5{times}10{sup 13} cm{sup {minus}2}) P coimplant is performed this electron concentration is increased by 65{percent}. The same dose Si implants in InAlP show a maximum effective activation of 3.9{percent} with no P coimplantation and 5.2{percent} with a P-implant dose 1.5 times the silicon dose. The apparent donor ionization energies are estimated from variable temperature Hall measurements to be 2{endash}5 meV for InGaP and {approximately}80 meV for InAlP. The deeper level in InAlP is attributed to the DX level found in ...
1996-06-01
On Boron Diffusion in MgF{sub 2}
The MgF{sub 2} monocrystals were irradiated at room temperature with 390 keV B{sup +} ions up to the fluence of 10{sup 16} cm{sup -2}. The irradiated samples were (isochronally and isothermally) annealed in high vacuum at the temperatures 200 deg. C, 300 deg. C, 400 deg. C, 500 deg. C, 600 deg. C and 700 deg. C for the times ranging from 2-100 hours. After each annealing step, the boron depth distribution was determined using the neutron depth profiling technique. As implanted, the depth distributions of boron exhibited standard Gaussian-like forms, but the evaluated profile parameters, R{sub P} = 960 nm and {delta}R{sub P} = 140 nm, were higher than those calculated using the SRIM code (R{sub P} = 870 nm and {delta}R{sub P} = 115 nm). Annealing at temperatures up to 400 deg. C did not change the depth profiles. Annealing at 600 deg. C, however, led to a one-way gradual transfer of the boron atoms from the site of implantation towards the ...
2009-03-10
Nucleation, growth and dissolution of extended defects in implanted Si: impact on dopant diffusion
Energy Technology Data Exchange (ETDEWEB)
Transient Enhanced Diffusion (TED) of boron in silicon is driven by the large supersaturations of self-interstitial silicon atoms left after implantation which also often lead to the nucleation and subsequent growth, upon annealing, of extended defects. In this paper we review selected experimental results and concepts concerning boron diffusion and/or defect behavior which have recently emerged with the ion implantation community and briefly indicate how they are, or will be, currently used to improve 'predictive simulations' softwares aimed at predicting TED. In a first part, we focus our attention on TED and on the formation of defects in the case of 'direct' implantation of boron in silicon. In a second part, we review our current knowledge of the defects and of the diffusion behavior of boron when annealing preamorphised Si. In a last part, we try to compare these two cases and to ...
1999-01-01
Nucleation, growth and dissolution of extended defects in implanted Si: impact on dopant diffusion
International Nuclear Information System (INIS)
Transient Enhanced Diffusion (TED) of boron in silicon is driven by the large supersaturations of self-interstitial silicon atoms left after implantation which also often lead to the nucleation and subsequent growth, upon annealing, of extended defects. In this paper we review selected experimental results and concepts concerning boron diffusion and/or defect behavior which have recently emerged with the ion implantation community and briefly indicate how they are, or will be, currently used to improve 'predictive simulations' softwares aimed at predicting TED. In a first part, we focus our attention on TED and on the formation of defects in the case of 'direct' implantation of boron in silicon. In a second part, we review our current knowledge of the defects and of the diffusion behavior of boron when annealing preamorphised Si. In a last part, we try to compare these two cases and to find out what are the reasons for some ...
1999-01-01
Influence of irradiation spectrum and implanted ions on the amorphization of ceramics
Energy Technology Data Exchange (ETDEWEB)
Polycrystalline Al2O3, magnesium aluminate spinel (MgAl2O4), MgO, Si3N4, and SiC were irradiated with various ions at 200-450 K, and microstructures were examined following irradiation using cross-section TEM. Amorphization was not observed in any of the irradiated oxide ceramics, despsite damage energy densities up to {similar_to}7 keV/atom (70 displacements per atom). On the other hand, SiC readily amorphized after damage levels of {similar_to}0.4 dpa at room temperature (RT). Si3N4 exhibited intermediate behavior; irradiation with Fe{sup 2+} ions at RT produced amorphization in the implanted ion region after damage levels of {similar_to}1 dpa. However, irradiated regions outside the implanted ion region did not amorphize even after damage levels > 5 dpa. The amorphous layer in the Fe-implanted region of Si3N4 did not appear if the specimen was simultaneoulsy irradiated with 1-MeV He{sup +} ions at RT. By comparison ...
1995-12-31
Adaptive meshing technique applied to an orthopaedic finite element contact problem.
Finite element methods have been applied extensively and with much success in the analysis of orthopaedic implants. Recently a growing interest has developed, in the orthopaedic biomechanics community, in how numerical models can be constructed for the optimal solution of problems in contact mechanics. New developments in this area are of paramount importance in the design of improved implants for orthopaedic surgery. Finite element and other computational techniques are widely applied in the analysis and design of hip and knee implants, with additional joints (ankle, shoulder, wrist) attracting increased attention. The objective of this investigation was to develop a simplified adaptive meshing scheme to facilitate the finite element analysis of a dual-curvature total wrist implant. Using currently available software, the analyst has great flexibility in mesh generation, but must prescribe element ...
2004-01-01
Tribological behavior of duplex coating improved by ion implantation
Energy Technology Data Exchange (ETDEWEB)
In the present paper the tribological behavior of the coatings are discussed. Duplex coatings were applied on cold working steel 100Cr6. Samples were plasma nitrided at different thickness of plasma surface layers. TiN was deposited with a classic BALZERS PVD equipment and subsequent ion implantation. Ion implantation was provided with N{sup 5+} ions. The other samples were produced with IBAD technology in DANFYSIK chamber. Wear resistance and exchanges of friction coefficient were measured with on-line test using special designed tribology equipment. Following the tests, the wear zone morphology and characteristics of surface layer structure as well as important properties were investigated by scanning electron microscopy (SEM) and X-ray diffraction analysis (XRD). Scratch adhesion testing was performed using commercially available equipment. Energy dispersive X-ray analysis (EDAX) of the wear-scars on pins provided essential information on ...
2004-07-01
The Reduction of TED in Ion Implanted Silicon
International Nuclear Information System (INIS)
The leading challenge in the continued scaling of junctions made by ion implantation and annealing is the control of the undesired transient enhanced diffusion (TED) effect. Spike annealing has been used as a means to reduce this effect and has proven successful in previous nodes. The peak temperature in this process is typically 1050 deg. C and the time spent within 50 deg. C of the peak is of the order of 1.5 seconds. As technology advances along the future scaling roadmap, further reduction or elimination of the enhanced diffusion effect is necessary. We have shown that raising the peak temperature to 1175 deg. C or more and reduction of the anneal time at peak temperature to less than a millisecond is effective in eliminating enhanced diffusion. We show that it is possible to employ a sequence of millisecond anneal followed by spike anneal to obtain profiles that do not exhibit gradient degradation at the junction and have junction depth and sheet resistance ...
2008-11-03
Study of iodine migration in zirconia using stable and radioactive ion implantation
Energy Technology Data Exchange (ETDEWEB)
The large uranium fission cross section leading to iodine and the behaviour of this element in the cladding tube during energy production and afterwards during waste storage is a crucial problem, especially for {sup 129}I which is a very long half-life isotope (T=1.59 x 10{sup 7} yr). Since a combined external and internal oxidation of the zircaloy cladding tube occurs during the reactor processing, iodine diffusion parameters in zirconia are needed. In order to obtain these data, stable iodine atoms were first introduced by ion implantation into zirconia with an energy of 200 keV and a dose equal to 8 x 10{sup 15} at cm{sup -2}. Diffusion profiles were measured using 3 MeV alpha-particle Rutherford backscattering spectrometry at each step of the annealing procedure between 700 C and 900 C. In such experiments a reduced iodine concentration was observed, which correlated to a diffusion-like process. Similar analysis has been performed using radioactive {sup 131}I ...
1998-03-01
Positioning of self-assembled InAs quantum dots by focused ion beam implantation
International Nuclear Information System (INIS)
Self-assembled quantum dots (QDs) are envisioned as building blocks for realization of novel nanoelectronic devices, for which the site-selective growth is highly desirable. This thesis presents a successful route toward selective positioning of self-assembled InAs QDs on patterned GaAs surface by combination of in situ focused ion beam (FIB) implantation and molecular beam epitaxy (MBE) technology. First, a buffer layer of GaAs was grown by MBE before a square array of holes with a pitch of 1-2 #mu#m was fabricated by FIB implantation of Ga and In, ions respectively. Later, an in-situ annealing step followed by InAs deposition was performed. The InAs QDs were preferentially formed in the holes generated by FIB. The influence of ion dose, annealing parameters and InAs amount was investigated in this work. With optimized parameters, more than 50 % single dot occupancy per hole is achieved. Furthermore, the photoluminescence spectra from ...
2006-07-01
Plasma nitriding of stainless steels at low temperatures
Energy Technology Data Exchange (ETDEWEB)
To avoid the drop in corrosion resistance of stainless steels in conventional nitriding (precipitation of CrN), low-temperature techniques like ion implantation, plasma immersion ion implantation (PIII, PI{sup 3}) and low-temperature plasma nitriding were developed. In this investigation, four stainless-steel grades (ferritic: X6Cr17, austenitic-ferritic: X2CrNiMoN22.5.3, austenitic: X8CrNiTi18.10 and X5CrNi18.10) were plasma-nitrided between 250 and 500 C. Nitrogen-enriched layers with a high nitrogen content were produced, leading to a significant increase in surface hardness. X-ray diffraction indicated that CrN did not precipitate if treatment temperatures did not exceed 400 C. 'Expanded austenite' formed in the austenitic and duplex steels and {epsilon}-nitride (Fe{sub 2}N{sub 1-x}) in the ferritic steel. The optically visible structure of the nitrided cases is comparable with that of the PIII layers, with higher charging ...
1999-09-01
Optimization of advanced PMOS junctions using Ge, B and F co-implants
International Nuclear Information System (INIS)
The main challenges for PMOS ultra shallow junction formation remain the transient enhanced diffusion (TED) and the solid solubility limit of boron in silicon. It has been demonstrated that low energy boron implantation and spike annealing are key in meeting the 90nm technology node ITRS requirements. To meet the 65nm technology requirements many studies have used fluorine co-implantation with boron and Si"+ or Ge"+ pre-amorphization (PAI) and spike annealing. Although using BF_2"+ can be attractive for its high throughput, self-amorphization and the presence of fluorine, many studies have shown that the fluorine successfully reduce TED, its energy needs to be well optimized with respect to the boron's, therefore BF_2"+ does not present the right fluorine/boron energy ratio for the optimum junction formation. In this work we optimize the fluorine energy for boron energies down to 200eV. We show the dependence of optimized junction on Ge"+ ...
2005-08-01
Kinetic Monte Carlo (KMC) simulations for boron diffusion in ion-implanted crystalline materials
Energy Technology Data Exchange (ETDEWEB)
In this paper, we report kinetic Monte Carlo study on the diffusion behavior of boron in silicon crystal, more particularly on the transient enhanced diffusion (TED) of boron in silicon during implantation and annealing. Firstly, the accuracy of our KMC code was verified by investigating the time evolutionary behavior of interstitial (I) and vacancy (V) when a silicon substrate is implanted with silicon dose with an energy of 10 keV and with a dose of 1 X 10{sup 14} ions/cm{sup 2}. To investigate the influence of native defects (I, V) on boron diffusion, a single and multi boron markers grown by MBE were employed. The simulation results revealed that the precursor of boron cluster (BI{sub 2}) is dominant at the initial stage of annealing, which explains the boron TED phenomenon in terms of the concentration of boron complexes and I, V clusters, respectively. The formation of {l_brace}311{r_brace} defects and dislocation loop were observed from ...
2004-11-15
Kinetic Monte Carlo (KMC) simulations for boron diffusion in ion-implanted crystalline materials
International Nuclear Information System (INIS)
In this paper, we report kinetic Monte Carlo study on the diffusion behavior of boron in silicon crystal, more particularly on the transient enhanced diffusion (TED) of boron in silicon during implantation and annealing. Firstly, the accuracy of our KMC code was verified by investigating the time evolutionary behavior of interstitial (I) and vacancy (V) when a silicon substrate is implanted with silicon dose with an energy of 10 keV and with a dose of 1 X 10"1"4 ions/cm"2. To investigate the influence of native defects (I, V) on boron diffusion, a single and multi boron markers grown by MBE were employed. The simulation results revealed that the precursor of boron cluster (BI_2) is dominant at the initial stage of annealing, which explains the boron TED phenomenon in terms of the concentration of boron complexes and I, V clusters, respectively. The formation of #left brace#311#right brace# defects and dislocation loop were observed from the ...
2004-11-01
Ion beams in silicon processing and characterization
Energy Technology Data Exchange (ETDEWEB)
General trends in integrated circuit technology toward smaller device dimensions, lower thermal budgets, and simplified processing steps present severe physical and engineering challenges to ion implantation. These challenges, together with the need for physically based models at exceedingly small dimensions, are leading to a new level of understanding of fundamental defect science in Si. In this article, we review the current status and future trends in ion implantation of Si at low and high energies with particular emphasis on areas where recent advances have been made and where further understanding is needed. Particularly interesting are the emerging approaches to defect and dopant distribution modeling, transient enhanced diffusion, high energy implantation and defect accumulation, and metal impurity gettering. Developments in the use of ion beams for analysis indicate much progress has been made in one-dimensional ...
1997-05-01
Energy Technology Data Exchange (ETDEWEB)
In this paper, we propose to characterize boron transient enhanced diffusion (TED) for processes currently used for P{sup +}/N ultra-shallow junctions (USJ) fabrication. Indeed, the fundamental understanding of boron diffusion for low energy boron implantation is mandatory to evaluate the scalability of such processes for the coming complementary metal-oxide-semiconductor (CMOS) transistor generations. In these experiments, we characterize the boron anomalous diffusion, thanks to boron buried marker-layers obtained by epitaxial growth. B{sup +} and BF{sub 2}{sup +} ultra-low energy (ULE) implantations and plasma doping (PLAD) using BF{sub 3} as precursor gas are carried out to compare the two techniques used for advanced USJ fabrication. Boron diffusion behaviors are analyzed via secondary ion mass spectrometry for annealing at 700 deg. C for 5 min and 15 min. Finally this paper brings some physical insights explaining the technological benefit ...
2005-08-01
International Nuclear Information System (INIS)
In this paper, we propose to characterize boron transient enhanced diffusion (TED) for processes currently used for P"+/N ultra-shallow junctions (USJ) fabrication. Indeed, the fundamental understanding of boron diffusion for low energy boron implantation is mandatory to evaluate the scalability of such processes for the coming complementary metal-oxide-semiconductor (CMOS) transistor generations. In these experiments, we characterize the boron anomalous diffusion, thanks to boron buried marker-layers obtained by epitaxial growth. B"+ and BF_2"+ ultra-low energy (ULE) implantations and plasma doping (PLAD) using BF_3 as precursor gas are carried out to compare the two techniques used for advanced USJ fabrication. Boron diffusion behaviors are analyzed via secondary ion mass spectrometry for annealing at 700 deg. C for 5 min and 15 min. Finally this paper brings some physical insights explaining the technological benefit coming from PLAD ...
2005-08-01
Interactions of ion-implantation-induced interstitials with boron at high concentrations in silicon
Energy Technology Data Exchange (ETDEWEB)
Ion implantation of Si (60 keV, 1{times}10{sup 14}/cm{sup 2}) has been used to introduce excess interstitials into silicon predoped with high background concentrations of B, which were varied between 1{times}10{sup 18} and 1{times}10{sup 19}/cm{sup 3}. Following post-implantation annealing at 740{degree}C for 15 min to allow agglomeration of the available interstitials into elongated {l_brace}311{r_brace} defects, the density of the agglomerated interstitials was determined by plan-view transmission electron microscopy observation of the defects. We report a significant reduction in the fraction of excess interstitials trapped in {l_brace}311{r_brace} defects as a function of boron concentration, up to nearly complete disappearance of the {l_brace}311{r_brace} defects at boron concentrations of 1{times}10{sup 19}/cm{sup 3}. The reduction of the excess interstitial concentration is interpreted in terms of boron-interstitial clustering, and ...
1996-09-01
Interactions of ion-implantation-induced interstitials with boron at high concentrations in silicon
International Nuclear Information System (INIS)
Ion implantation of Si (60 keV, 1x10"1"4/cm"2) has been used to introduce excess interstitials into silicon predoped with high background concentrations of B, which were varied between 1x10"1"8 and 1x10"1"9/cm"3. Following post-implantation annealing at 740 degree C for 15 min to allow agglomeration of the available interstitials into elongated #left brace#311#right brace# defects, the density of the agglomerated interstitials was determined by plan-view transmission electron microscopy observation of the defects. We report a significant reduction in the fraction of excess interstitials trapped in #left brace#311#right brace# defects as a function of boron concentration, up to nearly complete disappearance of the #left brace#311#right brace# defects at boron concentrations of 1x10"1"9/cm"3. The reduction of the excess interstitial concentration is interpreted in terms of boron-interstitial clustering, and implications for transient-enhanced ...
Energy Technology Data Exchange (ETDEWEB)
We have simulated the transient enhanced diffusion (TED) of boron fluoride (BF{sub 2}{sup +}) implanted in crystalline and germanium amorphized silicon. Based on recently published models, the effect of fluorine on boron diffusion in silicon has been introduced and a modelling has been suggested. In order to simulate the boron experimental profiles, we have assumed that fluorine forms clusters involving interstitial boron which reduces the junction depth. Experimental results indicate that fluorine behaviour depends on amorphization energy. Moreover, even no germanium preamorphization is performed, silicon is still amorphized by fluorine species. Hence, BF{sub 2}{sup +} implantation leads to an amorphous/crystalline (a/c) interface near the surface. An improvement of published models is suggested taking into account fluorine effects. The simulations satisfactory reproduce the SIMS experimental profiles for a large scale of experimental ...
2002-01-01
Helium ion implantation in SiAlON: Characterisation of cavity structures using TEM and IBA
International Nuclear Information System (INIS)
Highly swollen nanoporous layers produced in material surfaces by He implantation are of special interest for applications such as catalysis. Here we investigate whether nanoporous layers can be produced in the covalently bonded insulating ceramic, SiAlON. The retention of highly swollen porous structures in thinned TEM sections prepared from such hard brittle materials is particularly challenging. We have successfully prepared such sections both parallel to, and perpendicular to, the implanted surface. At intermediate doses the bubble structures are very similar to those found in metals. At high helium doses local swellings at depths around the mean projected range of the He ions (#approx#360 nm) are estimated to be well in excess of 200%. Bubble structures are stable under heating to temperatures up to 1200 deg. C. It is found that the highly cavitated layer is buried below a crystalline overlayer of compact SiAlON. This overlayer is ...
2000-05-02
Formation of stable dopant interstitials during ion implantation of silicon
Energy Technology Data Exchange (ETDEWEB)
High concentrations of self-interstitials are trapped by dopant atoms during ion implantation into Si. For group V dopants, these complexes are sufficiently stable to survive solid-phase-epitaxial (SPE) growth but break up on subsequent thermal processing and cause a transient-enhanced diffusion. Dopant diffusion coefficients are enhanced by up to five orders of magnitude over tracer values and are characterized by an activation energy of approximately one half of the tracer values. In the case of group III dopants, any complexes formed during implantation do not survive SPE growth but a second source of self-interstitials becomes significant and leads to similar transient effects. This is the damaged layer underlying the original amorphous/crystalline interface. These observations provide direct evidence for long-range self-interstitial migration in Si, and we believe these are the first observations of the interstitialcy diffusion mechanism ...
1986-05-01
Formation of stable dopant interstitials during ion implantation of silicon
International Nuclear Information System (INIS)
High concentrations of self-interstitials are trapped by dopant atoms during ion implantation into Si. For group V dopants, these complexes are sufficiently stable to survive solid-phase-epitaxial (SPE) growth but break up on subsequent thermal processing and cause a transient-enhanced diffusion. Dopant diffusion coefficients are enhanced by up to five orders of magnitude over tracer values and are characterized by an activation energy of approximately one half of the tracer values. In the case of group III dopants, any complexes formed during implantation do not survive SPE growth but a second source of self-interstitials becomes significant and leads to similar transient effects. This is the damaged layer underlying the original amorphous/crystalline interface. These observations provide direct evidence for long-range self-interstitial migration in Si, and we believe these are the first observations of the interstitialcy diffusion mechanism ...
International Nuclear Information System (INIS)
The effect of hydrostatic pressure applied at high temperature on photoluminescence of Si-implanted SiO_2 films was studied. A 'blue'-shift of PL spectrum from the SiO_2 films implanted with Si"+ ions to total dose of 1.2x10"1"7 cm"-"2 with increase in hydrostatic pressure was observed. For the films implanted with Si"+ions to a total dose of 4.8x10"1"6 cm"-"2 high temperature annealing under high hydrostatic pressure (12 kbar) causes a 'red'-shift of photoluminescence spectrum. The 'red' photoluminescence bands are attributed to Si nanocrystals while the 'blue' ones are related to Si nanocrystals of reduced size or chains of silicon atoms or Si-Si defects. A decrease in size of Si nanocluster occurs in result of the pressure-induced decrease in the diffusion of silicon atoms. (author)
2001-09-23
Energy Technology Data Exchange (ETDEWEB)
Tensile specimens of the normalized and tempered fully martensitic steel DIN 1.4914 were helium implanted up to 340 appm within the temperature range 300-720/sup 0/C using a 104 MeV alpha particle beam. The high He/damage ratio of 1850 appm He/dpa allowed to determine the effect of helium on material properties. After irradiation tensile strength and ductility were investigated mainly at test temperatures equal to the irradiation temperatures. While short time irradiations with helium contents up to 100 appm have shown no visible effect on the tensile behaviour at all temperatures investigated, long time irradiations reduced the material strength at irradiation temperatures above about 440/sup 0/C. This irradiation induced softening obscured the predicted minor hardening effect of the observed He-bubbles completely and increases with irradiation time and temperature. The fracture mode of helium-implanted and control specimens is found to remain ...
1988-07-01
Energy Technology Data Exchange (ETDEWEB)
We report on the elimination of defect formation which is associated with high dose indium implantations under solid phase epitaxial regrowth (SPER) annealing conditions of 650-800 deg. C. This is achieved by incorporating a layer of epitaxially grown Si{sub 1-y}C {sub y} layer, strategically located at the end-of-range (EOR) of the implant profile. An indium implant of 115 keV at 1 x 10{sup 14} cm{sup -2} was performed followed by annealing at temperature ranges of 650-800 deg. C. Samples with the Si{sub 1-y}C {sub y} layer revealed the elimination of secondary EOR defects with effectively suppressed indium transient enhanced diffusion (TED), indicating the function of carbon as an efficient sink for silicon interstitials at reduced annealing temperatures, in the SPER dopant activation regime.
2006-05-10
Energy Technology Data Exchange (ETDEWEB)
Transient-enhanced diffusion (TED) during thermal annealing of ion-implanted B in Si is well established and attributed to the ion-induced, excess interstitials. On the other hand, the mechanism to account for TED of B in preamorphized (PA) Si remains unclear. Enhanced diffusion of the B persists in regrown layers even though the ion-induced interstitial defects responsible for TED in B{sup +}-only implanted Si are eliminated following regrowth. To test the hypothesis that TED in PA Si results from the {open_quotes}excess{close_quotes} interstitial-type defects below the amorphous-crystalline (a-c) interface, a buried PA layer has been recrystallized from the surface inward to the SiO{sub 2} interface of silicon-on-insulator material to eliminate all possible sources of excess interstitials. The effect on B diffusion and the role of the residual interstitial-type defects will be discussed. {copyright} {ital 1999 American Institute of Physics.}
1999-02-01
A transient enhanced diffusion model of lattice restoration during rapid thermal annealing (RTA)
International Nuclear Information System (INIS)
A transient-enhanced diffusion has been observed during the furnace or rapid thermal annealing of As-implanted Si. The relations of the enhanced diffusion to residual defects and lattice restoration have been studied in detail. The As concentration profiles and residual defects are measured. It is found from the data that the lattice has been restored when the implanted sample is annealed at 1150 deg C (or 1050 deg C) for 1s. The defect density decreases rapidly with increase of annealing time (from 1 to 12s). The enhanced diffusion coefficient maximum appears in the annealing time ranging from 1 to 5s. Allmost a 'complete' annealing of displacemet damage is obtained and the diffusion coefficient is less than that in above-mentioned conditions when the implanted samples are annealed at 1150 deg C in the time ranging from 12 to 20s. the mechanism of lattice restoration and enhanced diffusion in annealing process have been ...
Energy Technology Data Exchange (ETDEWEB)
The main driver in ultra-shallow formation for the 65 nm technology node and beyond is to find solutions that both reduce boron transient enhanced diffusion and can be integrated in the CMOS process flow. To this end, many studies have recently focused on using co-doping techniques with fluorine and most recently with carbon. In most cases, one or both of these is co-implanted with a dopant specie in pre-amorphized silicon. In this work, we show a comparative study of fluorine or carbon co-implanted with low-energy boron to form source and drain extension junctions for PMOS devices. We will show that by a systematic optimization of germanium, boron, fluorine or carbon energies and doses, spike annealing technology can be extended to the 65 nm node. These results will be used to discuss how the different formed junctions offer potential solutions for either low-power or high-performance PMOS device fabrication.
2005-12-05
Energy Technology Data Exchange (ETDEWEB)
Physico-chemical characterizations performed on samples of 100Cr6 steel implanted both with boron and nitrogen revealed the formation of boron nitride along with the following new phases: Fe{sub 1-x}(B, N), Fe{sub 2-x}(B, N) and Fe{sub 3-x}(B, N). A thorough analysis of boron NITRIDE (5BN) indicates that a low ion current density (3 {mu}A.cm{sup -2}) in the case of the boron plus nitrogen sequence favours the formation of sp{sup 2} bonds (hexagonal-BN) while a higher ion current density (6{mu}A.cm{sup -2}) promotes sp{sup 3} bonds (cubic-BN) in the opposite sequence. Tribological tests carried out on these samples revealed that nitrogen and boron implantations do not lead to any significant improvement of friction and wear at variance with the results obtained by others authors. However, on a set samples accidentally contaminated with carbon during implantation, we noticed a considerable improvement of these tribological ...
1996-07-09
Energy Technology Data Exchange (ETDEWEB)
The formation, migration and agglomeration in silicon of fluorine-vacancy complexes have been monitored by single-detector Doppler broadening spectroscopy. After electronics engineers found that fluorine ion implantation effectively eliminated the transient-enhanced diffusion of dopants in the creation of ultra-shallow junctions, a vital step in the further miniaturization of device structures, positron beams have played a pivotal role in providing an insight into the mechanisms underlying this phenomenon, being able to detect FV complexes in implanted and annealed samples. Secondary Ion Mass Spectrometry has provided complementary information on fluorine concentrations so that the nature of the F{sub m}V{sub n} complexes can be further assessed. New results on Si and SiGe structures are presented.
2008-10-31
Treatment of hilar cholangiocarcinoma with inserting biliary double stents
International Nuclear Information System (INIS)
Objective: To investigate the inserting technique of biliary double stents in treating hilar cholangiocarcinoma. Methods: 6 patients with hilar cholangiocarcinoma (Bismuth IV) were treated by percutaneous transhepatic insertion of biliary stents. Double stents were inserted in each patient. Different inserting methods were adopted according to the branch angles formed by left and right hepatic ducts. Results: The jaundice of all patients alleviated or disappeared obviously after stent implantation. The average difference between post-and pre-operation in the serum total bilirubin level was (104 #+-# 29) #mu#mol/L (P<0.01). Stent obstruction was found in 2 cases after 4 and 6 months respectively. Conclusion: Double stents implantation is effective for the treatment of hilar cholangiocarcinoma. Beware of the angulation between main hepatic duct and adopting different inserting methods. (authors)
2004-10-01
Energy Technology Data Exchange (ETDEWEB)
Stainless steels can be nitrided at temperatures {<=}400 C to increase their hardness and wear resistance without a decreasing of their excellent corrosion resistance. Structure and properties of the surface layers produced by plasma nitriding and plasma immersion ion implantation in this temperature range were tested. There are negligible differences in the structure of the produced surface layers in spite of different interaction principles of the used technologies. However there are clear differences between the case of different steels. The case of ferritic chromium steels mainly consists of {epsilon}-nitride. Whereas the cases of austenitic and ferritic austenitic steels are characterized by expanded austenite. The corrosion resistance of the steels is reduced by nitriding only, if evident CrN-formation occurs. (orig.) 11 refs.
1999-08-01
International Nuclear Information System (INIS)
We have studied the ion-beam synthesis of GaSb nanocrystals in Si by high-fluence '' hot '' implantation of Sb and Ga ions followed by thermal annealing. The Rutherford backscattering, transmission electron microscopy/transmission electron diffraction, Raman spectroscopy and photoluminescence were used to characterize the implanted layers. It was found that the nanocrystal size increases from 5 to 60 nm in the samples annealed at 900"oC up to 20-90 nm in those annealed at 1100"oC. For the samples annealed at 900"oC a broad band in the region of 0.75-1.05 eV is registered in the photoluminescence spectra. The nature of this photoluminescence band is discussed. (author)
2011-07-01
Silicon oxide conductivity of hydrogen ion implanted polysilicon thin film transistors
Energy Technology Data Exchange (ETDEWEB)
The influence of hydrogen ion implantation into the channel polysilicon of polysilicon thin film transistors on gate oxide conductivity has been investigated. Data for effective tunnelling barriers at the gate oxide/channel polysilicon interface are presented. A value of 1.2eV for samples with boron doped channel polysilicon is calculated. For hydrogenated boron doped samples tunnelling barriers higher than 2.1 eV are obtained. The tunnelling barriers for phosphorus doped samples are impurity concentration dependent and decrease with increasing phosphorus concentration in the range 3 x 10{sup 17} to 3 x 10{sup 19} cm{sup -3}. (Author).
1996-10-01
Silicon oxide conductivity of hydrogen ion implanted polysilicon thin film transistors
International Nuclear Information System (INIS)
The influence of hydrogen ion implantation into the channel polysilicon of polysilicon thin film transistors on gate oxide conductivity has been investigated. Data for effective tunnelling barriers at the gate oxide/channel polysilicon interface are presented. A value of 1.2eV for samples with boron doped channel polysilicon is calculated. For hydrogenated boron doped samples tunnelling barriers higher than 2.1 eV are obtained. The tunnelling barriers for phosphorus doped samples are impurity concentration dependent and decrease with increasing phosphorus concentration in the range 3 x 10"1"7 to 3 x 10"1"9 cm"-"3. (Author).
British Library Electronic Table of Contents (United Kingdom)
Introduction: Patients in underdeveloped nations have limited access to life-saving medical technology including cardiac rhythm management (CRM) devices. We evaluated alternative means to provide such technology to this patient population while assessing the safety and efficacy of such a practice. Methods: Patients in the United States with clinical indications for extraction of CRM devices were consented. Antemortem CRM devices were cleaned and sterilized following a protocol established at our institution. Surveillance in vitro cultures were performed for quality assurance. The functional status of pulse generators was tested with a pacing system analyzer to confirm at least 70% battery life. Most generators were transported, in person, to an implanting institution in Nicaragua. Recipien...
2011-01-01
British Library Electronic Table of Contents (United Kingdom)
We report the fabrication and characterization of glucose-tolerant Raney-platinum cathodes for oxygen reduction in potentially implantable glucose fuel. Fabricated by extraction of aluminum from 1mm thin platinum-aluminum bi-layers annealed at 300^oC, the novel cathodes show excellent resistance against hydrolytic and oxidative attack. This renders them superior over previous cathodes fabricated from hydrogel-bound catalyst particles. Annealing times of 60, 120, and 240min result in approximately 400-550nm thin porous films (roughness factors ~100-150), which contain platinum and aluminum in a ratio of ~9:1. Aluminum release during electrode operation can be expected to have no significant effect on physiological normal levels, which promises good biocompatibility. Annealing time has a dis...
2010-01-01
British Library Electronic Table of Contents (United Kingdom)
We present a novel fabrication route yielding Raney-platinum film electrodes intended as glucose oxidation anodes for potentially implantable fuel cells. Fabrication roots on thermal alloying of an extractable metal with bulk platinum at 200^oC for 48h. In contrast to earlier works using carcinogenic nickel, we employ zinc as potentially biocompatible alloying partner. Microstructure analysis indicates that after removal of extractable zinc the porous Raney-platinum film (roughness factor ~2700) consists predominantly of the Pt3Zn phase. Release of zinc during electrode operation can be expected to have no significant effect on physiological normal levels in blood and serum, which promises good biocompatibility. In contrast to previous anodes based on hydrogel-bound catalyst particles the ...
2010-01-01
International Nuclear Information System (INIS)
We report the fabrication of p"+/n junctions using Ge"+, C"+, and B"+ co-implantation and a spike anneal. The best junction exhibits a depth of 26 nm, vertical abruptness of 3 nm/decade, and sheet resistance of 520 Ohm/square. The junction location is defined by where the boron concentration drops to 10"1"8 cm"-"3. These junctions are close to the International Technology Roadmap specifications for the 65 nm technology node and are achieved by careful engineering of amorphization, stresses, and point defects. Advanced simulation of boron diffusion is used to understand and optimize the process window. The simulations show that the optimum process completely suppresses the transient-enhanced diffusion of boron and the formation of boron-interstitial clusters. This increases the boron solubility to 20% above the equilibrium solid-state solubility.
2005-08-01
International Nuclear Information System (INIS)
Pre-amorphization of ultrashallow implanted boron in Silicon-on-insulator is optimized to produce an abrupt box-like doping profile with negligible electrical deactivation and significantly reduced transient enhanced diffusion. The effect is achieved by positioning the as-implanted amorphous/crystalline interface close to the buried oxide interface, to minimize interstitials whilst leaving a single-crystal seed to support solid-phase epitaxy. Based on a simple physical model of our results, we estimate that the interface between the Si overlayer and the buried oxide is an efficient interstitial sink with a recombination length of the order of 10nm or less under our experimental conditions. (author)
2008-12-01
British Library Electronic Table of Contents (United Kingdom)
The aim of this study was to develop a nanostructured Nb2O5-natural hydroxyapatite bulk composite to serve as an alternative biocompatible bulk material for implants. A set of samples of hydroxyapatite from fish bones with different concentrations of Nb2O5 were designed. They were prepared through a milling process, compacted under different pressures (350, 450, 550 and 650MPa) and sintered in air atmosphere at 1000^oC for 1h. The results revealed that the prepared composites presented strong interactions between the two elements and showed improvement in the sinterability with significant densification and microstructure changes, suggesting that they are promising for implants meant to replace bone tissues.
2011-01-01
International Nuclear Information System (INIS)
Up to now, P diffusion in Ge is modeled with an effective diffusivity involving at most a quadratic dependence with the free electron concentration (n). However, recent theoretical studies suggest the existence of a triply negatively charged state for the free vacancy in germanium and experimental data indicate that the E center (PV pair) in Ge has a double acceptor state. These two facts would be consistent with a diffusivity model involving a cubic dependence with n. In this paper the validity of this approach is checked for both pure thermal diffusion (intrinsic and extrinsic) and implanted phosphorus, using either our own experiments or other data available from the literature. Although some discrepancies still exist in some cases for the redistribution of implanted P, it is shown that the introduction of this cubic dependence significantly improves the overall agreement as compared with the usual model.
2010-02-26
Energy Technology Data Exchange (ETDEWEB)
The advent of carbon nanotubes, which are graphite layers convoluted in cylinders several nanometers in diameter and several micrometers in length, as well as the experiments on implanting metal atoms in such tubes open the way to producing nanoconductors and other materials with unique properties. For theorists, the basic challenge is interpreting and predicting the structure and properties of these systems. The linearized augmented-plane-wave method (LAPW) is one of the most accurate methods in the theory of the electronic structure of solids. A generalization of this method for quasi-two-dimensional systems, surface electronic states, and layered crystals is known. The LAPW theory for quasi-unidimensional systems, which exhibit translational symmetry in one direction, has been absent thus far. In this paper, the authors suggest a version of such a theory and use this method to calculate the electronic structure of carbyne (a linear chain of carbon atoms) and ...
1995-10-01
Energy Technology Data Exchange (ETDEWEB)
The present study is devoted to the investigation of the mechanism of aluminium nitriding by a technique that employs implantation of low-energy nitrogen ions and diffusional transport of atoms. The nitriding of aluminium is investigated, because this is a method for surface modification of aluminium and has a potential for application in a broad spectrum of fields such as automobile, marine, aviation, space technologies, etc. However, at present nitriding of aluminium does not find any large scale industrial application, due to problems in the formation of stoichiometric aluminium nitride layers with a sufficient thickness and good quality. For the purposes of this study, ion nitriding is chosen, as an ion beam method with the advantage of good and independent control over the process parameters, which thus can be related uniquely to the physical properties of the resulting layers. Moreover, ion nitriding has a close similarity to plasma nitriding and plasma ...
2002-09-01
British Library Electronic Table of Contents (United Kingdom)
Background: High satisfaction rates have been reported after autologous breast reconstruction. Yet, most mastectomy patients receive implant reconstructions (ImBR). Independent and active decision makers have shown mainly to choose for autologous reconstructions, such as the Deep inferior epigastric perforator (DIEP) flap (DiepBR). To further explore the decision making to opt for either ImBR or DiepBR, we investigated patient knowledge, informational resources used, effect of plastic surgeons' advice, coping style and personal independence. Methods: A total of 153 women, who were planned for DiepBR or ImBR preoperatively, completed a study-specific and standardised validated psychological questionnaire. Analyses were aimed at information-seeking behaviour, personal independence and coping...
2011-01-01
Energy Technology Data Exchange (ETDEWEB)
The aim of this work is the implantation and characterization of a neutron radiography system that uses an electronic device for attainment of images in real time, for its implementation in the nuclear research reactor Argonauta at IEN/CNEN (Nuclear Engineering Institute of the Brazilian Nuclear Energy Commission). The Electronic Imaging System in Real Time is composed by a scintillator screen for neutron, a video camera (CCD), a digital plate and a computer with specific computational programs for digital processing of the images. The System in installed real time is apt to carry through neutron radiography inspections of static and dynamic events of several types of samples. (author)
2004-04-15
British Library Electronic Table of Contents (United Kingdom)
The purpose of this study was to investigate whether hydroxyapatite (HAp) coating could induce polyethylene terephthalate (PET) artificial ligament graft osseointegration in the bone tunnel. Twenty-four New Zealand white rabbits underwent artificial ligament graft transplantation in bilateral proximal tibia tunnels. One limb was implanted with HAp-coated PET graft, and the contralateral limb was implanted with non-HAp-coated PET graft as control. The rabbits were randomly sacrificed at four and eight?weeks after surgery. The loads to failure of the experimental group at eight?weeks were significantly higher than those of the control group (p?=?0.0057). Histologically, application of HAp coating induced new bone formation between graft and bone at eight?weeks compared with the controls. Rea...
2011-01-01
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films
Energy Technology Data Exchange (ETDEWEB)
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films are investigated using Rutherford backscattering and channelling techniques. Epitaxial growth of Pd/sub 2/Si films was observed at room temperature by argon ion implantation into as-deposited Pd/Si(111) structures and furnace-annealed Pd/sub 2/Si(polycrystalline)/Pd/sub 2/Si(epitaxial)/Si(111) structures. Some additional experiments to check the growth mechanisms are also presented, in which the implantation energies, substrate orientations and dose rates were changed. Finally, the stability of the ion-beam-induced epitaxial Pd/sub 2/Si films on subsequent furnace annealing is studied.
1982-06-11
Growth meachnisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films
Energy Technology Data Exchange (ETDEWEB)
Growth mechanisms and thermal stability of ion-beam-induced epitaxial Pd/sub 2/Si films are investigated using Rutherford backscattering and channelling techniques. Epitaxial growth of Pd/sub 2/Si films was observed at room temperature by argon ion implantation into as-deposited Pd/Si(111) structures and furnace-annealed Pd/sub 2/Si(polycrystalline)/Pd/sub 2/Si(epitaxial)/Si(111) structures. Some additional experiments to check the growth mechanisms are also presented, in which the implantation energies, substrate orientations and dose rates were changed. Finally, the stability of the ion-beam-induced epitaxial Pd/sub 2/Si films on subsequent furnace annealing is studied.
1982-06-11
Energy Technology Data Exchange (ETDEWEB)
During the recrystallization by solid-phase-epitaxial (SPE) growth of supersaturated silicon alloys, a high concentration of interstitials is trapped. These are released by subsequent heating causing a transient (greatly enhanced) diffusion of the substitutional dopant by an interstitialcy mechanism. The enhancement may be as much as five orders of magnitude over tracer values, and shows an activation energy of only 1.8 +- 0.2 eV. Following the transient, the interstitials condense into loops, allowing an independent estimate to be made of their concentration. From these observations, we propose that during ion implantation, a fraction of the implanted dopants can acquire their natural valency, and retain it as the crystallization interface passes. For group V dopants this creates the trapped interstitials, giving transient enhanced diffusion when they are released by subsequent annealing.
1984-08-01
Enhanced diffusion from interstitial trapping during solid-phase-epitaxial growth of silicon alloys
Energy Technology Data Exchange (ETDEWEB)
During the recrystallization by solid-phase-expitaxial (SPE) growth of supersaturated silicon alloys, a high concentration of interstitials is trapped. These are released by subsequent heating causing a transient (greatly enhanced) diffusion of the substitutional dopant by an interstitialcy mechanism. The enhancement may be as much as five orders of magnitude over tracer values, and shows an activation energy of only 1.8 +/- 0.2 eV. Following the transient, the interstitials condense into loops, allowing an independent estimate to be made of their concentration. From these observations, it is proposed that during ion implantation, a fraction of the implanted dopants can acquire their natural valency, and retain it as the crystallization interface passes. For group V dopants this creates the trapped interstitials, giving transient enhanced diffusion when they are released by subsequent annealing. 12 references, 6 figures.
1984-01-01
Energetic ion beams in semiconductor processing: Summary of a DOE panel study
Energy Technology Data Exchange (ETDEWEB)
The trend toward smaller dimensions in integrated circuit technology presents severe physical and engineering challenges for ion implantation. These challenges, together with the need for physically-based models at exceedingly small dimensions, are leading to a new level of understanding of fundamental defect science in silicon. Recently the DOE Council on Materials requested that our panel examine the current status and future research opportunities in the area of ion beams in semiconductor processing. Particularly interesting are the emerging approaches to defect and dopant distribution modeling, transient enhanced diffusion, high energy implantation and defect accumulation, and metal impurity gettering. These topics were explored both from the perspective of emerging science issues and technology challenges.
1995-12-31
International Nuclear Information System (INIS)
Dimensioning of actinides waste packages for long duration storage has to take into account helium production from natural decay and release rates from the material. For the latter, we propose here an improved method for the determination of the helium diffusion coefficient in britholite, to be used for minor actinides storage. This work is based on results we previously published using the classical three steps method: "3He implantation on a Van de Graaff facility, "3He profile determination analysing the protons resulting from the "3He(d,p)"4He reaction in a nuclear microprobe, evolution of the helium profile during annealings. Taking explicitly into account the incident deuterons energy stragglings allows us to show that the implanted helium profiles are bimodal, each component leading to a different helium diffusion coefficient.
2005-02-01
DBR laser with nondynamic plasma grating formed by focused ion beam implanted dopants
Energy Technology Data Exchange (ETDEWEB)
A static plasma grating has been demonstrated experimentally in a large optical cavity FIB-DBR GaAlAs/GaAs laser diode. The grating is formed by implanting stripes of dopants with a focused ion beam (FIB). The dopants ionize to form periodic fluctuations in the carrier concentration which, through the Kramers-Kronig relations, form an index grating. A model of the grating strength for optimization of the laser design is developed and presented here. The computed results show that /kappa/ can be increased by more than an order of magnitude over the 15 cm/sup -1/ experimentally. Therefore, FIB-DBR (or -DFB) lasers with performance comparable to that of conventional DBR (or DFB) lasers can be expected.
1989-06-01
DBR laser with nondynamic plasma grating formed by focused ion beam implanted dopants
International Nuclear Information System (INIS)
A static plasma grating has been demonstrated experimentally in a large optical cavity FIB-DBR GaAlAs/GaAs laser diode. The grating is formed by implanting stripes of dopants with a focused ion beam (FIB). The dopants ionize to form periodic fluctuations in the carrier concentration which, through the Kramers-Kronig relations, form an index grating. A model of the grating strength for optimization of the laser design is developed and presented here. The computed results show that #kappa# can be increased by more than an order of magnitude over the 15 cm"-"1 experimentally. Therefore, FIB-DBR (or -DFB) lasers with performance comparable to that of conventional DBR (or DFB) lasers can be expected.
British Library Electronic Table of Contents (United Kingdom)
Sinus lifting and reconstruction of localized alveolar defects are often required after closure of a large oroantral fistula (OAF) to allow for subsequent implant installation. This study describes a combined surgical technique that involves sinus lifting, bony closure, and reconstruction of the alveolar defect at the site of an OAF. The sinus membrane was reconstructed as a continuous layer by combining the residual sinus membrane with a rotated part of oral mucosa around the OAF. Autogenous bone from the chin and/or ramus was grafted into the prepared sinus space and alveolar defect, and the graft was covered by a buccal advancement flap. This technique was used to treat 8 patients who had large OAFs in the posterior maxillary region. The treatment was successful in all cases, and the te...
2011-01-01
Cardiac Pacing: Memories of a Bygone Era
British Library Electronic Table of Contents (United Kingdom)
The first cardiac pacemaker implants occurred in the late 1950s and involved insertion of epicardial or epimyocardial leads and abdominal pulse generators. By the mid 1960s, cardiologists were making attempts to insert transvenous leads into the right ventricle. These early unipolar leads had large, polished, high polarization electrodes, no fixation device, and no lumen in which to place a stylet for lead positioning. The lead implantation procedures were usually long and the irradiation to both patient and operator excessive. Pulse generators were powered by zinc-mercury cells, which were large, unreliable, and prone to sudden output failure. Postoperative complications such as lead dislodgement, exit block, and premature power source failure were very common with most patients requiring...
2008-01-01
Energy Technology Data Exchange (ETDEWEB)
SIMS measurements revealed that high energy boron-implantation causes transient enhanced diffusion (TED) of a shallow dopant profile due to Si interstitials even for a relatively low dose of {approximately}2E13cm{sup {minus}2}. By systematic analysis, it is found that this anomalous diffusion is most significant in 700--800 C annealing, and it takes place in the initial stage (less than 30 sec for 800 C) of annealing. Moreover, this anomalous diffusion is more considerable than the enhanced diffusion during oxidation (OED) in practical device fabrication processes. It is found that rapid thermal annealing (RTA) at 1,000--1,100 C is effective for suppressing the transient enhanced diffusion and realizing a shallow channel profile for deep sub-micron devices.
1995-12-31
International Nuclear Information System (INIS)
SIMS measurements revealed that high energy boron-implantation causes transient enhanced diffusion (TED) of a shallow dopant profile due to Si interstitials even for a relatively low dose of #approx#2E13cm"-"2. By systematic analysis, it is found that this anomalous diffusion is most significant in 700--800 C annealing, and it takes place in the initial stage (less than 30 sec for 800 C) of annealing. Moreover, this anomalous diffusion is more considerable than the enhanced diffusion during oxidation (OED) in practical device fabrication processes. It is found that rapid thermal annealing (RTA) at 1,000--1,100 C is effective for suppressing the transient enhanced diffusion and realizing a shallow channel profile for deep sub-micron devices.
Biological effects and physical safety aspects of NMR imaging and in vivo spectroscopy
Energy Technology Data Exchange (ETDEWEB)
An assessment is made of the biological effects and physical hazards of static and time-varying fields associated with the NMR devices that are being used for clinical imaging and in vivo spectroscopy. A summary is given of the current state of knowledge concerning the mechanisms of interaction and the bioeffects of these fields. Additional topics that are discussed include: (1) physical effects on pacemakers and metallic implants such as aneurysm clips, (2) human health studies related to the effects of exposure to nonionizing electromagnetic radiation, and (3) extant guidelines for limiting exposure of patients and medical personnel to the fields produced by NMR devices. On the basis of information available at the present time, it is concluded that the fields associated with the current generation of NMR devices do not pose a significant health risk in themselves. However, rigorous guidelines must be followed to avoid the physical interaction of these fields ...
1985-08-01
Atomic scale simulations of arsenic ion implantation and annealing in silicon
International Nuclear Information System (INIS)
We present results of multiple-time-scale simulations of 5, 10 and 15 keV low temperature ion implantation of arsenic on silicon (100), followed by high temperature anneals. The simulations start with a molecular dynamics (MD) calculation of the primary state of damage after 10ps. The results are then coupled to a kinetic Monte Carlo (MC) simulation of bulk defect diffusion and clustering. Dose accumulation is achieved considering that at low temperatures the damage produced in the lattice is stable. After the desired dose is accumulated, the system is annealed at 800 degrees C for several seconds. The results provide information on the evolution for the damage microstructure over macroscopic length and time scales and affords direct comparison to experimental results. We discuss the database of inputs to the MC model and how it affects the diffusion process.
2004-12-15
A novel EPROM device fabricated using focused boron ion-beam implantation
Energy Technology Data Exchange (ETDEWEB)
A novel floating-gate avalanche injection (FAMOS) type erasable programmable read-only memory (EPROM) device is demonstrated, with a heavily focused ion-beam (FIB) implanted region of about 0.2-..mu..m width at the drain edge of the channel. This heavily B/sup +/-doped region permits a higher electric field near the drain edge, resulting in a remarkable increase of the hot-carrier generation rate, and reduces both the programming voltage and programming time. A three-dimensional device simulator, CADDETH, predicted that the electric field at the drain edge would increase by about six times, which would lead to hot-carrier generation efficiency three orders of magnitude higher.
1987-06-01
UK PubMed Central (United Kingdom)
Uteroglobin (UG) gene encodes a cytokine-like, multifunctional, antiinflammatory protein, with potent phospholipase A2-inhibitory activity. It has been suggested that during implantation this protein...Full Text Available
1995-07-01
This report describes a technique of inserting an implantable venous access port (portacath) through a thrombosed and occluded vein employing a pre-existing peripherally inserted central catheter (PICC) as the route of access. The PICC was used as a conduit for venous access in a way that has not been described previously in the literature. This procedure was performed in a young patient with cystic fibrosis in an effort to prevent the use of his virgin contralateral veins, which might be used in the future.
2010-02-15
UK PubMed Central (United Kingdom)
ObjectiveWe wanted to evaluate the status of self-expandable nitinol stents implanted in the P2 and P3 segments of the popliteal artery in Korean patients.Materials...Full Text Available
2011-03-01
Study of transient enhanced dopant diffusion in silicon and proposed limiting methods
International Nuclear Information System (INIS)
The transient enhanced diffusion in crystalline silicon implanted with dopants ad followed by high temperature annealing to activate the dopants is introduced. The physical mechanisms of transient enhanced dopant diffusion are then reviewed together with a short introduction to the proposed suppressing methods. Finally, the perspectives with using high energy heavy ions in this field are briefly discussed
2001-09-01
Study of implantation damage in germanium formed using Ga"+ FIB
International Nuclear Information System (INIS)
Full text: It is known that the ion implantation of germanium single crystals at room temperature results in drastic alteration of the germanium surface and the formation of cellular relief. Voids were found into the near-surface damage layer. The intersection of these voids with the germanium surface, as result of sputter etching, forms cellular relief. However, exact mechanism responsible for formation of the voids is not known. A 10 and 30 keV Ga"+ irradiation of Ge #left brace#100#right brace# crystal at room temperature was carried out using a focused ion beam (FIB) system with a dose in the range 0.5x10"1"2 to 1.5x10"1"4 ion/cm"2. The topology of the modified germanium surface and the structure of the radiation damage was studied using imaging facilities of the FIB systems and transmission electron microscopy. The strong cellular structure of Ge was observed after an ion dose of 3x10"1"3 ion/cm"2. High-resolution TEM showed a complex structure of the ...
International Nuclear Information System (INIS)
By the methods of the angular distribution of photon annihilation, time distribution of photon annihilation, photoluminescence spectroscopy, Fourier IR-spectroscopy, atomic force microscopy the detail information on relation of the structural and physical properties of the porous nano-structures is obtained. Study of pores sizes in a different nano-porous materials, such as the porous silicon, porous anode aluminium oxide, porous solids exposed to light atoms ion implantation (hydrogen, deuterium, helium) is carried out.
2003-09-15
Energy Technology Data Exchange (ETDEWEB)
Silicon on insulator (SOI) structures are promising candidates for the fabrication of VLSI circuits with very high packing densities. The preparation of such structures can now be achieved by high dose implantation of reactive ion species such as oxygen to produce buried layers of SiO/sub 2/ in silicon. In this paper we report experiments to depth profile these layered structures by SIMS. SOI samples have been prepared by implanting (100) silicon wafers with 400 keV molecular oxygen ions at a dose of 1.8x10/sup 18/ O/sup +/ cm/sup -2/. During the implantation the wafers were maintained at temperatures between 325 and 600/sup 0/C, using beam heating, which achieved in situ-annealing and ensured that the top silicon layer remained single crystal. Analysis was carried out on an Atomika DIDA-II spectrometer using 10 keV Ar/sup +/ ions with a low current density of less than 1 mA cm/sup -2/. During analysis negative secondary ...
1983-12-15
International Nuclear Information System (INIS)
After five years of implantation of a program for classification and signalling of restricted areas in the IPEN-CNEN-SP, we noticed that the applied measures of radio protection contributed for the improvement of the system of occupational radiological protection, promoting an improvement in the security of the workers, towards the planning in the execution of the activities involving the use of sources of ionizing radiation. Later, during the implantation of this program, the service of occupational radiological protection, there was great difficulty to conciliate its necessities in terms of security signalling, face the absence of existing standardisation in the country for the minimum disposals on the subject in question. Nowadays there are different interpretations of the specific criteria and many effective normative documents that exist in the country. This work presents as proposal the elaboration of a technical guide whose objective is ...
Percutaneous osseointegrated prostheses for amputees: Limb compensation in a 12-month ovine model.
Percutaneous osseointegrated prostheses are being investigated as an alternative strategy to attach prosthetic limbs to patients. Although the use of these implants has shown to be promising in clinical trials, the ability to maintain a skin seal around an osseointegrated implant interface is a major challenge to prevent superficial and deep periprosthetic infections. The specific aim of this study was to establish a translational load-bearing ovine model to assess postoperative limb compensation and gait symmetry following a percutaneous osseointegrated implant. We tested the following hypotheses: (1) the animals would return to pre-amputation limb loads within 12-months; (2) the animals would return to a symmetrical gait pattern (stride length and time in stance) within 12-months. The results demonstrated that one month following surgery, the sheep loaded their amputated limb to a mean value of nearly 80% of their ...
2011-09-13
Oxygen, hydrogen, and deuterium effects on plasma nitriding of metal alloys
International Nuclear Information System (INIS)
We report the oxygen, hydrogen, and deuterium effects on nitrogen implantation of stainless steel. Oxygen is absorbed on the surface creating a potential barrier and diminishing the nitrogen retention. Deuterium removes more oxygen from the surface than hydrogen, augmenting the nitrogen chemical potential and yielding faster nitrogen diffusion into the bulk material.
2006-04-01
ONR-NRL Superconducting Materials Symposium: A forecast
Partial Contents: Ternary Compounds; Granular Superconductors; Superconductivity in (SN)x and its Halogen Derivative (SNBr0.4)x; Studies of cuCl at Elevated Pressures; Superconducting Properties of Hydride Systems; Thin Film Superconducting Materials Research; Synthesis of Superconducting Nb3Si using High Pressures; Synthesis of Unstable A-15 Compounds by Epitaxial Recrystallization of Ion Implanted Layers; and Sputtering of Nb3Si.
1979-01-01
Mediation of bone ingrowth in porous hydroxyapatite bone graft substitutes.
Previous investigations have shown that both the early biological response and the mechanical properties of a porous hydroxyapatite bone graft substitute are highly sensitive to its pore structure. The objective of this study was to evaluate whether the pore structure continued to influence bone integration in the medium to long term. Two screened batches of porous hydroxyapatite (PHA) designated as batch A and batch B, with porosities of approximately 60 and 80%, respectively, were selected for this study and implanted for periods of 5, 13, and 26 weeks into the lower femur of New Zealand White rabbits. Histomorphometric analysis of the absolute volume of bone ingrowth within batch A and B implants from 5 to 26 weeks showed that the absolute volume of bone ingrowth was consistently lower in batch A (10-21%), compared to batch B implants (24-31%). However, when the volume of bone ingrowth was normalised for the available ...
2004-01-01
Intercomparison of Retrospective Radon Detectors
Energy Technology Data Exchange (ETDEWEB)
We performed both a laboratory and field intercomparison of two novel glass-based retrospective radon detectors previously used in major radon case-control studies performed in Missouri and Iowa. The new detectors estimate retrospective residential radon exposure from the accumulation of a long-lived radon decay product, Pb-210, in glass. The detectors use track registration material in direct contact with glass surfaces to measure the alpha emission of a Pb-210 decay product, Po-210. The detector's track density generation rate (tracks cm{sup -2} hr{sup -1}) is proportional to the surface alpha activity. In the absence of other strong sources of alpha emission in the glass, the implanted surface alpha activity should be proportional to the accumulated Po-210 and hence, the cumulative radon gas exposure. The goals of the intercomparison were to: (1) perform collocated measurements using two different glass-based retrospective radon detectors in a ...
1998-11-01
Energy Technology Data Exchange (ETDEWEB)
The influence of MeV electrons irradiation on the gate oxide layers of hydrogenated polysilicon thin film transistors (TFTs) was investigated by measuring gate leakage currents and threshold voltages. The experimental data revealed a decrease of oxide trap density and increase of positive oxide charge. Improvement in the interface roughness and in the oxide quality near the bottom interface was observed.
2006-02-15
International Nuclear Information System (INIS)
The influence of MeV electrons irradiation on the gate oxide layers of hydrogenated polysilicon thin film transistors (TFTs) was investigated by measuring gate leakage currents and threshold voltages. The experimental data revealed a decrease of oxide trap density and increase of positive oxide charge. Improvement in the interface roughness and in the oxide quality near the bottom interface was observed.
2006-02-01
International Nuclear Information System (INIS)
Intervertebral spacers for anterior spine fusion are made of different materials, such as titanium and cobalt chromium alloys and carbon fiber-reinforced polymers. Implant-related susceptibility artifacts can decrease the quality of MRI scans. The aim of this cadaveric study was to demonstrate the extent that implant-related MRI artifacting affects the postfusion differentiation of determined regions of interest (ROIs). In six cadaveric porcine spines, we evaluated the postimplantation MRI scans of a titanium, cobalt-chromium and carbon spacer that differed in shape and surface qualities. A spacer made of human cortical bone was used as a control. A defined evaluation unit was divided into ROIs to characterize the spinal canal as well as the intervertebral disc space. Considering 15 different MRI sequences read independently by an interobserver-validated team of specialists the artifact-affected image quality of the median MRI slice was rated ...
2007-02-01
Halflives of rp-Process Waiting Point Nuclei
Energy Technology Data Exchange (ETDEWEB)
The fragment separator at GSI, Darmstadt, has been used to produce and separate very proton rich nuclei in the {sup 100}Sn region. By fragmentation of a {sup 112}Sn beam at 1 A{center_dot}GeV we produced nuclei along the rp-process path between {sup 77}Y and {sup 98}In. By implanting these ions into a silicon detector stack we were able to determine their halflives. Preliminary data are presented.
1999-12-31
UK PubMed Central (United Kingdom)
PurposeRTOG protocol 95-17 was a phase I/II trial to evaluate multi-catheter brachytherapy as the sole method of adjuvant breast radiotherapy for stage I/II breast...Full Text Available
2007-12-01
Boron profiles in amorphous and crystalline silicon
Energy Technology Data Exchange (ETDEWEB)
The resonance reaction /sup 11/B(p,/alpha/)/sup 8/Be was used to determine the boron profiles in the surface of: (1) boron implanted silicon; (2) boron diffused silicon; and (3) boron containing films deposited on silicon wafers. The boron distribution in the various samples was found to be stable under the bombardment of the proton beam. The convolution process used to obtain yield curves from the depth distribution, and the program used for this purpose are described.
1989-01-01
Safety performance indicators. Topical issues paper no. 5
International Nuclear Information System (INIS)
Since its creation the nuclear industry has been struggling with the question of how safe is safe enough. Safety is a common goal to all involved in the design, operation and regulation of a nuclear installation. As a concept safety is not easy to define. However, there is a general understanding of what attributes a nuclear power plant should have in order to operate safely. The challenge lies in measuring the attributes. The new competitive open electricity market, in many countries throughout the world, is increasing the economic pressure on operators to lower operating costs without jeopardizing safety. Challenges are occurring at a rate that is unprecedented in the nuclear industry: competitiveness; downsizing; ageing; policy changes; reorganization; restructuring; mergers; globalization; and takeovers demand increasing attention to the management of safety. There are various means to measure safety performance, some of which are more qualitative in nature and others which through ...
2001-09-03
Energy Technology Data Exchange (ETDEWEB)
Purpose: To evaluate the success rates of the implantation of stent grafts in the treatment of peripheral aneurysms. Materials and methods: in 13 patients with 15 aneurysms at the common iliac artery (n = 6), external iliac artery (n = 1), hypogastric artery (n = 2), femoral artery (n = 2) or popliteal artery (n = 4), implantation of dacron-covered nitinol stents was performed. The patients were followed up for three to 20 months (mean, 8.8 months) with intravenous digital subtraction angiography, CT or colour-coded Doppler sonography. Results: In all cases, the aneurysm was successfully occluded after stent implantation. In one case with a popliteal aneurysm, kinking of the vessel caused thrombosis of the stent. The stent was successfully reopened. The aneurysm however, had to be surgically treated 9 months later. The primary and secondary patency rates at 6 months were 93% and 100%, respectively. Conclusion: The method ...
1998-03-01
Surface Roughness of Stainless Steel Bender Mirrors for FocusingSoft X-rays
Energy Technology Data Exchange (ETDEWEB)
We have used polished stainless steel as a mirror substrate to provide focusing of soft x-rays in grazing incidence reflection. The substrate is bent to an elliptical shape with large curvature and high stresses in the substrate require a strong elastic material. Conventional material choices of silicon or of glass will not withstand the stress required. The use of steel allows the substrates to be polished and installed flat, using screws in tapped holes. The ultra-high-vacuum bender mechanism is motorized and computer controlled. These mirrors are used to deliver focused beams of soft x-rays onto the surface of a sample for experiments at the Advanced Light Source (ALS). They provide an illumination field that can be as small as the mirror demagnification allows, for localized study, and can be enlarged, under computer control,for survey measurements over areas of the surface up to several millimeters. The critical issue of the quality of the steel surface, ...
2005-10-11
Right and left ventricular pressure-volume response to positive end-expiratory pressure.
Cardiovascular effects of positive end-expiratory pressure (PEEP) at 20 cmH2O were examined in six mongrel dogs (11.3-15.0 kg). The dogs were anesthetized through a combination of intramuscular Innovar and gaseous anesthesia (60% N2O-40% O2). For volume measurements, radiodense tantalum screws were placed on the endocardial surface of the left and right ventricle. Esophageal and left and right ventricular pressures were measured. With the use of this preparation, the effects of positive end-expiratory pressure (PEEP = 20 cmH2O) on cardiovascular function were examined. PEEP caused right ventricular transmural pressures to decrease, 3.4 +/- 1.0 to 2.0 +/- 1.0 mmHg end-diastolic (P less than 0.05) and 29.2 +/- 2.2 to 27.9 + 2.2 mmHg peak systolic; left ventricular transmural pressures decreased, 5.9 +/- 1.6 to 1.2 +/- 1.4 mmHg end-diastolic (P less than 0.05) and 117.2 +/- 8.0 to 76.2 +/- 7.4 mmHg peak systolic (P less than 0.05). After volume loading the animal (500 ...
1984-01-01
Wood Plastic Composites (WPCs) have experienced a healthy growth during the last decade. However, improvement in properties is necessary to increase their utility for structural applications. The toughness of WPCs can be improved by creating a fine cellular structure while reducing the density. Extrusion processing is one of the most economical methods for profile formation. For our study, rectangular profiles were extruded using a twin-screw extrusion system with different grades of HDPE and with varying wood fibre and lubricant contents together with maleated polyethylene (MAPE) coupling agent to investigate their effects on WPC processing and mechanical properties. Work has been done to redesign the extrusion system setup to achieve smoother and stronger profiles. A guiding shaper, submerged in the water, has been designed to guide the material directly through water immediately after exiting the die; instead of passing it through a water cooled vacuum ...
2010-01-01
Energy Technology Data Exchange (ETDEWEB)
Four HVDC (high voltage DC) {+-} 250kV submarine OF (oil-filled) cables are to be installed each capable of 1.4-million kW for one dipole channel and two returns for forwarding to Yura Switchyard a part of the power to be generated by a Tachibanawan coal-fired power plant to open in 2000. The first cable is now being laid. They are to cover a distance of 48km on the sea bottom, and their 190mm diameter is the largest in the world and this decreases the required number of cables for a reduction in the construction cost. The installation is executed by use of a dedicated cable laying ship loaded with cables. The ship is equipped with five thruster screws by adjusting which a cable is fed into the sea and laid on the bottom with high positional accuracy in all directions, and with a 10m-accurate DPS (Dynamic Positioning System) besides GPS (Global Positioning System). Operating on the sea bottom is a simultaneous laying/burying machine which buries the cable 2-3m deep ...
1998-07-01
Energy Technology Data Exchange (ETDEWEB)
The high-purity-oxygen activated sludge process will be used to expand secondary treatment capacity and improve water quality in Santa Monica Bay. The facility is operated by the city of Los Angeles Department of Public Works` Bureau of Sanitation. The overall Hyperion Full Secondary Project is 30% complete, including a new headworks, a new primary clarifier battery, an electrical switch yard, and additional support facilities. The upgrading of secondary facilities is 50% complete, and construction of the digester facilities, the waste-activated sludge thickening facility, and the second phase of the three-phase modification to existing primary clarifier batteries has just begun. The expansion program will provide a maximum monthly design capacity of 19,723 L/s(450 mgd). Hyperion`s expansion program uses industrial treatment techniques rarely attempted in a municipal facility, particularly on such a large scale, including: a user-friendly intermediate pumping station featuring 3.8-m ...
1993-09-01
Energy Technology Data Exchange (ETDEWEB)
Rotary screw traps, located at four sites in the Grande Ronde River basin, were used to characterize aspects of early life history exhibited by juvenile Onchorhychus mykiss during migration years 1995-99. The Lostine, Catherine Creek and upper Grande Ronde traps captured fish as they migrated out of spawning areas into valley rearing habitats. The Grande Ronde Valley trap captured fish as they left valley habitats downstream of Catherine Creek and upper Grande Ronde River rearing habitats. Dispersal downstream of spawning areas was most evident in fall and spring, but movement occurred during all seasons that the traps were fished. Seaward migration occurred primarily in spring when O. mykiss smolts left overwintering area located in both spawning area and valley habitats. Migration patterns exhibited by O. mykiss suggest that Grande Ronde Valley habitats are used for overwintering and should be considered critical rearing habitat. We were unable to positively ...
2001-07-01
International Nuclear Information System (INIS)
Some of the Indian pressurized heavy water reactors (PHWRs) which use Stellite balls in the ball and screw mechanism of the adjustor rod drive mechanism in the moderator circuit have encountered high radiation fields in the moderator system due to "6"0Co. Release of particulate Stellite is responsible for the hotspots in addition to the general uniform contamination of internal surfaces with "6"0Co. Extensive laboratory studies have shown that it is possible to dissolve these Stellite particles by adopting a three-step redox process with permanganic acid as the oxidizing agent. These investigations with inactive Stellite in powder form helped to optimize the process conditions. Permanganic acid was found to have the highest dissolution efficiency as compared to alkaline and nitric acid permanganate. The susceptibility of Stellite to corrode or dissolve was found to depend on the concentration of the permanganate, pH and temperature of the process and microstructure ...
2011-06-01
International Nuclear Information System (INIS)
A selected series of 24 patients with displaced medial femoral neck fracture, treated with closed reduction and osteosynthesis with cancellous bone screws (ASIF), were investigated. During an observation period of 6 to 26 months, serial hip joint scintigraphies were performed and compared with serial X-ray examinations. At the first scintigraphic examination performed on average 5-6 weeks after the fracture, two separate investigators found a decreased amount of activity or no activity in the femoral head of 10 and 8 patients, respectively. At the second scintigraphic examination performed on average 11.1 weeks after the fracture both investigators found no activity or a decreased amount of activity in 8 patients. This figure declined to 7 during the following period, because one patient with decreased activity was recorded as having normal activity 15 months after the fracture. These 7 patients all developed radiological signs of femoral head collapse on average ...
Energy Technology Data Exchange (ETDEWEB)
Wood is currently having a renaissance as a domestic fuel. Wood pellets, usually about 8 mm in diameter and 40 mm long and produced from sawmill and wood processing residues by pressing without binders, are gaining general acceptance. According to a market analysis of Solar Promotion GmbH, Pforzheim, about 4,800 pellet-fuelled heating systems with automatic fuel supply and with a total thermal capacity of 35 kW are in operation in Germany, and 2000 new ones were installed in 2000. [German] Holz als Brennstoff erlebt in vielen Heizkellern und Kaminen eine Renaissance. Und zwar nicht in Form von Holzscheiten, sondern als kleine Presslinge, meist mit einem Durchmesser von acht und einer Laenge von bis zu 40 Millimetern. Als Abfallprodukt von Saegewerken und Holz verarbeitenden Betrieben werden die so genannten Pellets unter hohem Druck und ohne Bindemittel wie beispielsweise Leim hergestellt. Und dieser neue Brennstoff findet immer mehr Anhaenger. So sind im vergangenen Jahr nach einer ...
2002-03-01
Energy Technology Data Exchange (ETDEWEB)
A study conducted at the IHS had the aim to obtain basic information on whether it is possible to build flow turbines following the free jet principle that are on a par with, or superior to, the conventional design, especially in terms of performance and the efficiency curve. Several inflow contours with a ventilated free jet and a conventional flow turbine were studied. The direct comparison of these variants revealed a slightly enhanced peak load efficiency and a very distinct superiority of the free jet contour during partial load. But the efficiency of all variants failed to attain the values claimed by commercial manufacturers. As compared to the initial contour, peak load efficiency was enhanced by 5 per cent. During partial load, the variants studied showed a distinct superiority of the free jet concept over the contour of conventional flow turbines. (orig.) [Deutsch] Am IHS wurde eine Untersuchung mit dem Ziel durchgefuehrt, grundlegende Aussagen zu gewinnen, ob ...
1997-12-31
Taking transport to a higher plane
Energy Technology Data Exchange (ETDEWEB)
The coal transportation industry has played an integral role in determining coal markets, particularly in recent years, as the industry has evolved from cost-based pricing to market-based pricing. Aggressive pricing by Western rail carriers has caused extensive changes in coal marketing patterns in the Midwest. Multi-modal barge deliveries of Western and Appalachian coals have also played a significant, though lesser, role in changing coal markets. Eastern rail carriers have generally lagged in their aggressive pursuit of new coal markets and, to date, few changes in coal markets have been realised. The historic dominant role of transportation in shaping markets for coal will continue into the future as the utility industry contends with the effects of CAAA compliance and deregulation and as the coal industry contends with regional coal displacements and major imbalances in supply and demand. The dominance of rail transportation in defining coal distribution ...
1994-04-01
Energy Technology Data Exchange (ETDEWEB)
Microbial dechlorination of polychlorinated biphenyls (PCBs) often stops although a significant number of removable chlorines remain. To determine the reason for the cessation, we investigated the limitation of organic carbon, PCB bioavailability, and inhibition by metabolic products. Enrichment with carbon sources did not induce additional chlorination, indicating the plateau was not due to depletion of organic carbon. The bioavailability was not limiting, since a subcritical micelle concentration of the surfactant, which enhanced desorption without inhibiting dechlorinating microorganisms, failed to lower the plateau. Neither was it due to accumulation of metabolites, since no additional dechlorination was detected when plateau sediments were incubated with fresh medium. Similarly, dechlorination was not inhibited in freshly spiked sediment slurries. Dechlorination ended up at the same level with nearly identical congener profiles, regardless of treatment. These results indicate that ...
1996-12-31
Energy Technology Data Exchange (ETDEWEB)
Recurrent variceal bleeding due to liver cirrhosis led to treatment with a transjugular intrahepatic portosystemic shunt (TIPS) in a pregnant woman at 20 weeks` gestation. Fetal radiation exposure was estimated to be less than 10 mSv. The use of a graduated catheter allowed measurement of field size and reliable determination of the patient`s entrance dose. Radiation exposure of an approximated fetal dosage of 5.2 mSv did not justify abortion for medical reasons. Therefore, TIPS procedure is not generally contraindicated during pregnancy itself. TIPS placement may be a therapeutic option related to the severity of the underlying maternal disease, after radiation exposure of the fetus has been estimated. (orig.) [Deutsch] Bei rezidivierender Oesophagusvarizenblutung auf dem Boden einer Leberzirrhose wurde bei bestehender Schwangerschaft der 20. Woche ein transjugulaerer portosystemischer Stent-Shunt (TIPS) neu angelegt. Praeinterventionell wurde die zu erwartende Strahlenexposition fuer ...
1998-10-01
Market leadership by example: Government sector energy efficiency in developing countries
Energy Technology Data Exchange (ETDEWEB)
Government facilities and services are often the largest energy users and major purchasers of energy-using equipment within a country. In developing as well as industrial countries, government ''leadership by example'' can be a powerful force to shift the market toward energy efficiency, complementing other elements of a national energy efficiency strategy. Benefits from more efficient energy management in government facilities and operations include lower government energy bills, reduced greenhouse gas emissions, less demand on electric utility systems, and in many cases reduced dependence on imported oil. Even more significantly, the government sector's buying power and example to others can generate broader demand for energy-efficient products and services, creating entry markets for domestic suppliers and stimulating competition in providing high-efficiency products and services. Despite these benefits, with the exception of a few ...
2002-05-20
Environmental benefits and economic rationale of expanding the Italian natural gas private car fleet
International Nuclear Information System (INIS)
There are several concerns which bring to consider natural gas as a viable alternative to liquid fuels in transport. First, natural gas allows the curbing of global pollution in this steadily growing industry. Indeed, decoupling greenhouse gas emissions from transport growth has become a major issue in tackling climate change. Second, a more extensive use of natural gas would relieve city air quality, which is presently at levels harmful of human health. Nonetheless, this is just one side of the coin. The other side entails building a refuelling station network, and this carries financial requirements. The financing fraction holds a pivotal role in deciding whether natural gas for automotive purposes is an efficient solution. The final aim of this work is, therefore, to compare the natural gas advantages, stemming from avoided global and local emission, with the economic rationale of engaging in supplementary model network investments. A system dynamics model underlies this study's ...
2005-01-01
A comparison of x-ray detectors for mouse CT imaging
International Nuclear Information System (INIS)
There is significant interest in using computed tomography (CT) for in vivo imaging applications in mouse models of disease. Most commercially available mouse x-ray CT scanners utilize a charge-coupled device (CCD) detector coupled via fibre optic taper to a phosphor screen. However, there has been little research to determine if this is the optimum detector for the specific task of in vivo mouse imaging. To investigate this issue, we have evaluated four detectors, including an amorphous selenium (a-Se) detector, an amorphous silicon (a-Si) detector with a gadolinium oxysulphide (GOS) screen, a CCD with a 3:1 fibre taper and a GOS screen, and a CCD with a 2:1 fibre taper and both GOS and thallium-doped caesium iodide (CsI:Tl) screens. The detectors were evaluated by measuring the modulation transfer function (MTF), noise power spectrum (NPS), detective quantum efficiency (DQE), stability over multiple exposures, and noise in reconstructed CT images. The a-Se detector had the best MTF ...
2004-12-07
{beta}-decay half-lives of very neutron-rich isotopes of elements from Ti to Ni
Energy Technology Data Exchange (ETDEWEB)
The unknown {beta}-decay half-lives of 22 isotopes far off stability (5 < T{sub Z} < 10) in the region from Ti to Ni were measured at GSI, Darmstadt. The nuclei were produced in a fragmentation reaction of 500 A.MeV {sup 86}Kr-projectile impinging on a thick Be target. The isotopes of interest were separated and identified with the fragment separator, FRS, by a combination of B{rho},Z, and ToF techniques. An additional range separation was performed by a selective implantation into granular detectors. The spatial and time correlations of the implant with the consecutively detected {beta}-particles were used to determine the unknown half-lives. For nuclei far off stability, {beta}-decay chains were measured and analyzed as well, leading to an even more reliable evaluation of the lifetimes. The large discrepancies found between the measured and the theoretical values emphasize that most recent theoretical work is not an improvement over ...
1998-03-01
Transient enhanced diffusion of boron in silicon: The interstitial flux
Energy Technology Data Exchange (ETDEWEB)
Delta-doped boron marker layers in silicon have been used to test further the relationship between B transient enhanced diffusion (TED) and the flux of silicon interstitials released during the annealing stage following self implantation. The authors present new data which address a number of questions raised by the present models. They show that in the experiments bulk trapping of interstitials is significant only for low implant fluences ({approximately}10{sup 12} cm{sup {minus}2}). The origin of the observed diffusion-like profiles for the interstitial flux is instead found to lie in local trapping within the {delta}-doped layers themselves. Boron trapped in immobile clusters may be associated with Si interstitials in approximately a 1:1 ratio; nevertheless this trapping contribution alone may not entirely account for the observed gradient. They suggest that some part of the observed TED response with depth is attributable to local trapping ...
1997-11-01
Transient enhanced diffusion of boron in silicon: The interstitial flux
International Nuclear Information System (INIS)
Delta-doped boron marker layers in silicon have been used to test further the relationship between B transient enhanced diffusion (TED) and the flux of silicon interstitials released during the annealing stage following self implantation. The authors present new data which address a number of questions raised by the present models. They show that in the experiments bulk trapping of interstitials is significant only for low implant fluences (#approx#10"1"2 cm"-"2). The origin of the observed diffusion-like profiles for the interstitial flux is instead found to lie in local trapping within the #delta#-doped layers themselves. Boron trapped in immobile clusters may be associated with Si interstitials in approximately a 1:1 ratio; nevertheless this trapping contribution alone may not entirely account for the observed gradient. They suggest that some part of the observed TED response with depth is attributable to local trapping of silicon ...
1996-12-02
Pain is necessary for survival but chronic pain is disabling and causes significant health and economic problems. This study provides an understanding of the future for spinal cord stimulation. Stimulation by means of chronically implanted electrodes, was carried out in 200 patients with pain of varied benign organic etiology. In 177 of them, pain was confined to the failed back syndrome. Most patients were referred by a Pain Management Service. 226 epidural implants were used: 80 unipolar, 59 Resume, 12 bipolar, and 75 quadripolar. Patients were followed for periods of 6 months to 12 years, with a mean follow-up of 44 months. 84 patients (42%) were able to control their pain by stimulation alone, 22 patients (11%) needed occasional analgesic supplements along with their stimulation program. Pain secondary to failed back syndrome, multiple sclerosis, peripheral vascular disease, sympathetic dystrophy and diabetic neuropathy responded favorably. ...
1997-06-01
International Nuclear Information System (INIS)
Ingestion of HTO during oocyte maturation and continued during pre-implantation time was found to depress decidual response. At birth these offspring also showed a decrease in brain cell number. When HTO was given during pregnancy only, the offspring at birth showed a similar deficit in brain cell number. Even so, we could not demonstrate a gross deficit in oocyte maturation when HTO was ingested during sexual maturity only; however, when further continued during pregnancy, the measured newborn parameters were most severely affected. In this group, cell-multiplication in the cerebrum was severely decreased, protein synthesis was decreased, and somatic growth was also highly significantly decreased. These experiments indicate that even a short-term exposure to HTO during early pregnancy (pre-implantation) alters normal development to such an extent that it is still observable at birth. During embryonic development, HTO affected the rate of ...
1980-11-26
Energy Technology Data Exchange (ETDEWEB)
Current advanced CMOS source/drain engineering involves the use of amorphizing implants with 3D geometry. Upon annealing, the induced transient enhanced diffusion (TED) can only be accurately predicted if the amorphized region is correctly modeled, as well as the formation and evolution of extended defects, particularly 3 1 1's and dislocation loops. In addition to the extended defects, already modeled in the atomistic kinetic Monte-Carlo simulator DADOS, we have developed a physically based modeling approach for the implant-induced damage build-up, amorphization and recrystallization, suitable to handle device-size process simulation. It is based on amorphous pockets (3D, irregular shape agglomerates of an arbitrary number of interstitials and vacancies, plus trapped impurities) with a size-dependent activation energy for recombination. The model is able to reproduce experimental aspects like the crystal-amorphous transition ...
2004-12-15
International Nuclear Information System (INIS)
Current advanced CMOS source/drain engineering involves the use of amorphizing implants with 3D geometry. Upon annealing, the induced transient enhanced diffusion (TED) can only be accurately predicted if the amorphized region is correctly modeled, as well as the formation and evolution of extended defects, particularly 3 1 1's and dislocation loops. In addition to the extended defects, already modeled in the atomistic kinetic Monte-Carlo simulator DADOS, we have developed a physically based modeling approach for the implant-induced damage build-up, amorphization and recrystallization, suitable to handle device-size process simulation. It is based on amorphous pockets (3D, irregular shape agglomerates of an arbitrary number of interstitials and vacancies, plus trapped impurities) with a size-dependent activation energy for recombination. The model is able to reproduce experimental aspects like the crystal-amorphous transition temperature and ...
2004-12-15
Photoelectrochemistry of disordered passive films
Energy Technology Data Exchange (ETDEWEB)
A theoretical model, which describes subband gap photoexcitation involving localized electronic states, was developed. The escape probability of a charge carrier trapped in a localized state is considered via Poole-Frenkel, direct tunneling, or phonon-assisted tunneling processes, as competing escape mechanisms. Photoelectrochemical experiments were performed on the passive films formed on zirconium and amorphous iron-zirconium alloys and on pure HfO/sub 2/ films and HfO/sub 2/ films implanted with varying concentrations of xenon. These films were found to possess some degree of disorder depending on the substrate, the thickness of the film, and the extent of implantation. The spectral dependence of the photocurrent in all of the films studied is considerably different from what was found for crystalline passive films. The potential dependence of the photocurrent yields Poole-Frenkel behavior. Reverse tunneling processes were also observed at ...
1987-01-01
British Library Electronic Table of Contents (United Kingdom)
Financial DisclosurePhacoemulsification and implantation of a hydrophilic acrylic toric intraocular lens (IOL) (T-flex 623T) with customized cylindrical power was performed in 1 eye in 3 consecutive patients with cataract and high postkeratoplasty astigmatism (range 6.75 to 8.75 diopters [D]). Twelve months postoperatively, the uncorrected distance visual acuity improved from 20/200 to 20/30 in Case 1, from 20/400 to 20/40 in Case 2, and from 20/200 to 20/25 in Case 3 and the corrected distance visual acuity was 20/25 or better in all 3 eyes. The spheroequivalent was within +-0.50 D of the intended value and the refractive astigmatism was less than 1.00 D. The corneal grafts were transparent, and the endothelial cell loss range was 6% to 12%. Rotation of the toric IOL was less than 5 degre...
2011-01-01
Modeling of the Ostwald ripening of extrinsic defects and transient enhanced diffusion in silicon
Energy Technology Data Exchange (ETDEWEB)
We present an atomistic simulation of the Ostwald ripening of extrinsic defects (clusters, {l_brace}1 1 3{r_brace}s and dislocation loops) which occurs during annealing of ion implanted silicon. The model describes the capture and emission of Si interstitial atoms to and from extrinsic defects of sizes up to thousands of atoms and includes a loss term due to the flux of interstitials to the recombining surface. Key input parameters of the simulation are the variations of the formation energy and of the capture efficiency with the size of the different defects. This model shows that the kinetics of the well-known dissolution of {l_brace}1 1 3{r_brace} defects is only driven by the recombination efficiency at the surface and the distance from the defects to the sample surface. We have subsequently used this model to study defect evolution in low and ultra low energy (ULE) B implanted Si during annealing. Defect dissolution occurs earlier and at ...
2002-01-01
Modeling of the Ostwald ripening of extrinsic defects and transient enhanced diffusion in silicon
International Nuclear Information System (INIS)
We present an atomistic simulation of the Ostwald ripening of extrinsic defects (clusters, #left brace#1 1 3#right brace#s and dislocation loops) which occurs during annealing of ion implanted silicon. The model describes the capture and emission of Si interstitial atoms to and from extrinsic defects of sizes up to thousands of atoms and includes a loss term due to the flux of interstitials to the recombining surface. Key input parameters of the simulation are the variations of the formation energy and of the capture efficiency with the size of the different defects. This model shows that the kinetics of the well-known dissolution of #left brace#1 1 3#right brace# defects is only driven by the recombination efficiency at the surface and the distance from the defects to the sample surface. We have subsequently used this model to study defect evolution in low and ultra low energy (ULE) B implanted Si during annealing. Defect dissolution occurs ...
2002-01-01
International Nuclear Information System (INIS)
Radiation defects produced by helium implantation were used to shape profiles of palladium (Pd) and platinum (Pt) atoms in-diffusing (for 20 min at temperatures 600-800 deg. C) either from surface silicide (Pd_2Si, PtSi) or implanted layers. Results show that this procedure allows a strong localization of substitutional Pd and Pt at the depth where the damage produced by helium peaks. This results in local reduction of carrier lifetime by an almost ideal recombination centers - the acceptor level of substitutional Pd (E _c - 0.22 eV) or Pt (E _c - 0.23 eV). While optimum conditions for Pt in-diffusion are about 700 deg. C, Pd gives the best results already at lower temperatures (600 deg. C) where it also exhibits higher peak solubility. Both methods were used for optimization of turn-off properties of high power PiN diodes. The devices, where the lifetime was killed locally by Pd and Pt, exhibited similar trade-off between the static and ...
2006-12-01
International Nuclear Information System (INIS)
We report, for the first time to our knowledge, on the active optical planar waveguides in Nd : YAG laser crystals fabricated by O3+ ion implantation at low doses of ?1014 ions cm-2. The reconstructed refractive index profiles based on the measured dark-mode spectroscopy show that an enhanced refractive index well is created in the near-surface region, forming a non-leaky waveguide structure. With thermal annealing treatment at 260 0C for 90 min, the propagation losses of the waveguides could be reduced to ?3 dB cm-1 at a wavelength of 632.8 nm. The micro-luminescence investigation reveals that the emission bands of Nd3+ ions are not significantly affected by the waveguide formation processing, which shows promising potentials for efficient waveguide laser operations at near-infrared wavelength bands.
2008-09-07
British Library Electronic Table of Contents (United Kingdom)
This prospective study describes and evaluates a surgical approach for 3D reconstruction of the posterior maxilla with autogenous mandibular bone in 16 patients (mean age 51 years). Bone blocks were harvested from the mandible and used as lateral or vertical block grafts (onlay); they were also partially milled and used for sinus elevation (inlay). In 4 cases, anorganic bovine bone was added at the periphery of the blocks. 4 months after grafting, implants were placed in a second operation and loaded after 12 weeks. Lateral and vertical augmentations were measured immediately after grafting and at re-entry for implant placement. Mean lateral augmentation performed was 5.5mm, reduced to 4.3mm (p<0.01) after 4 months' healing. Mean vertical augmentation was 3.2mm, reduced to 2.1mm (p<0.01) a...
2010-01-01
International Nuclear Information System (INIS)
The local density functional theory is used to study the electrical levels and thermal stabilities of complexes of interstitial boron with O and C and a boron dimer with H. The energy levels of these defects are compared with those found from deep level transient capacitance spectroscopy experiments on irradiated p-Si containing B. The levels observed at E_c-0.23, E_v+0.29, and E_v+0.51 eV are assigned to B_iO_i, B_iC_s, and B_iB_sH_i respectively. B_iC_s is passivated by one H atom. Evidence for the existence of B_iC_s has implications for mechanisms involved in the suppression of transient-enhanced diffusion of boron in ion-implanted Si by C.
2003-07-28
Focused ion beam processes for high-T/sub c/ superconductors
International Nuclear Information System (INIS)
Focused ion beam (FIB) processes have been developed for Y--Ba--Cu--O superconductor films. A Y--Cu liquid metal ion source has been fabricated, using a Y_6_7 --Cu_3_3 eutectic alloy as the ion source. As-sputtered Y--Ba--Cu--O film etch rate ratios to GaAs(100) and Si(100) substrates are 0.28 and 1.4 for 130-keV Au"+ FIB ion etching, respectively. Y--Ba--Cu--O submicron patterns have been demonstrated by using FIB lithography and Cl_2 reactive ion beam etching. Moreover, a Y--Ba--Cu--O superconducting line with 4-#mu#m linewidth has been fabricated by annealing an as-sputtered Y--Ba--Cu--O line pattern. T/sub c/ control of Y--Ba--Cu--O film has been achieved by 200-keV Ne"+, using conventional ion implantation and 300 keV Si"+"+ FIB ion implantation.
International Nuclear Information System (INIS)
We present an approach for fabrication of intentionally positioned epitaxial InAs QDs in a micron sized light emitting diode. For site-selective growth, a combination of molecular beam epitaxy (MBE) and focused ion beam (FIB) implantation technology in an all-ultra-high-vacuum (UHV) setup has been employed. Single dot occupancy of almost 55 % on FIB patterned nano-depressions was successfully achieved. Thereafter, carrier injection and subsequent radiative recombination from the positioned InAs/GaAs self-assembled QDs was investigated by embedding these QDs in the intrinsic part of a GaAs-based micron sized p-i-n junction device. Few or single dot are expected to be electrically addressed in these devices. We report results from electroluminescence (EL) measurement which proves the single dot characteristics of our device. The EL spectra consist of sharp emission lines and their dependence on injection current shows linear behavior for exciton and quadratic ...
2010-03-21
Energy Technology Data Exchange (ETDEWEB)
In order to enhance the resistance to the pitting corrosion due to asepsis processes and to avoid structural fractures in dentistry drills, a plasma immersion ion implantation (PIII) treatment using nitrogen has been performed. The selected drill samples, made of AISI 434 based stainless steel with a 0.670 mm diameter, were treated at a -1kV bias between 350 C and 450 C, this temperature being controlled by both a 20-50 {mu}s pulse width and a 200-1000 Hz repetition rate in the bias. The drills were analysed by cyclic potentiodynamic tests showing a good pitting corrosion resistance when treated at around 400 C, as follows from a resulting very low hysteresis loop. Yet, the resistance appears somehow diminished by the presence of sputtering when processed at temperatures near 450 C. It is also found that the PIII nitriding effectiveness appears to be limited by the appearance of uniform corrosion. Finally, X-ray diffraction of the samples has revealed the presence ...
2007-07-01
Enhancement of surface properties of 45{number_sign} steel using plasma immersion ion implantation
Energy Technology Data Exchange (ETDEWEB)
45{number_sign} steel, which has good mechanical strength and is relatively cheap, is a common constituent in industrial components, such as precision gears, piston columns of oil pumps, and so on. However, since the working environment of these industrial parts is sometimes quite harsh and unforgiving, they are vulnerable to wear and corrosion. Replacing 45{number_sign} steel with stainless or alloy steel increases the cost significant, and a better alternative is to improve its surface properties and lifetime using plasma immersion ion implantation (PIII). The authors have devised a variety of treatment processes using PIII, including radio-frequency (RF) plasma nitriding, RF plasma nitriding and nitrogen PIII, Ti deposition in conjunction with nitrogen PIII (IBED), as well as Cr deposition followed by nitrogen PIII (IBED). To assess the efficacy of the processes, the microhardness and mass loss due to wear were measured for both the untreated and treated ...
1997-12-31
Endoluminal vascular prostheses; Endoluminale Gefaessprothesen
Energy Technology Data Exchange (ETDEWEB)
Endoluminal vascular prostheses that can be implanted by percutaneous routes represent the most recent development in vascular interventional radiology. Various commercially available types of prosthesis are presented and the construction principles and applications are described. At present secure indications for the implantation of endoluminal prostheses are limited to the elimination of aneurysms and arteriovenous fistulae of the large vessels near the trunk in sections that do not cross a joint. The wide use in peripheral occlusive diseases cannot yet be recommended because confirmed data are not available. (orig.) [German] Endoluminale Gefaessprothesen, die perkutan implantierbar sind, stellen die juengste Entwicklung in der vaskulaeren interventionellen Radiologie dar. Verschiedene kommerziell erhaeltliche Prothesentypen werden vorgestellt, ihr Konstruktionsprinzip und ihre Applikation erlaeutert. Die gesicherten Indikationen zur ...
2000-06-01
Effect of the Ge preamorphization dose on boron diffusion and defect evolution in silicon
Energy Technology Data Exchange (ETDEWEB)
In this paper, we study the effect of the Ge{sup +} preamorphization dose on boron diffusion and on the thermal evolution of end of range (EOR) defects during annealing. Amorphizations were carried out by implanting Ge{sup +} at 150 keV to doses ranging from 1x10{sup 15} to 8x10{sup 15} ions/cm{sup 2}. Boron was subsequently implanted at 3 keV with a dose of 1x10{sup 14} ions/cm{sup 2}. Rapid thermal annealing (RTA) was performed for various time/temperature combinations in nitrogen ambient. Secondary ion mass spectroscopy (SIMS) and transmission electron microscopy (TEM) were used to study boron diffusion and defect evolution, respectively. We have found that after a given annealing, both the defect size and boron diffusivity are independent on the Ge ion dose. Increasing this dose only results in an increase of the defect density. These results are discussed and definitely show that EOR defects are involved in a quasi-conservative Ostwald ...
2002-01-01
Effect of the Ge preamorphization dose on boron diffusion and defect evolution in silicon
International Nuclear Information System (INIS)
In this paper, we study the effect of the Ge"+ preamorphization dose on boron diffusion and on the thermal evolution of end of range (EOR) defects during annealing. Amorphizations were carried out by implanting Ge"+ at 150 keV to doses ranging from 1x10"1"5 to 8x10"1"5 ions/cm"2. Boron was subsequently implanted at 3 keV with a dose of 1x10"1"4 ions/cm"2. Rapid thermal annealing (RTA) was performed for various time/temperature combinations in nitrogen ambient. Secondary ion mass spectroscopy (SIMS) and transmission electron microscopy (TEM) were used to study boron diffusion and defect evolution, respectively. We have found that after a given annealing, both the defect size and boron diffusivity are independent on the Ge ion dose. Increasing this dose only results in an increase of the defect density. These results are discussed and definitely show that EOR defects are involved in a quasi-conservative Ostwald ripening process during annealing. ...
2002-01-01
Depth dependence of defect evolution and TED during annealing
Energy Technology Data Exchange (ETDEWEB)
A quantitative transmission electron microscopy (TEM) study on the depth profile of extended defects, formed after Si implantation, has been carried out. Two different Si{sup +} implant conditions have been considered. TEM analysis for the highest energy/dose shows that {l_brace}1 1 3{r_brace} defects evolve into dislocation loops whilst the defect depth distribution remains unchanged as a function of annealing time. For the lowest energy/dose, {l_brace}1 1 3{r_brace} defects grow and dissolve while the defect band shrinks preferentially on the surface side. At the same time, extraction of boron transient enhanced diffusion (TED) as a function of depth shows a decrease of the supersaturation towards the surface, starting at the location of the defect band. The study clearly shows that in these systems the silicon surface is the principal sink for interstitials. The results provide a critical test of the ability of physical models to simulate ...
2004-02-01
Depth dependence of defect evolution and TED during annealing
International Nuclear Information System (INIS)
A quantitative transmission electron microscopy (TEM) study on the depth profile of extended defects, formed after Si implantation, has been carried out. Two different Si"+ implant conditions have been considered. TEM analysis for the highest energy/dose shows that #left brace#1 1 3#right brace# defects evolve into dislocation loops whilst the defect depth distribution remains unchanged as a function of annealing time. For the lowest energy/dose, #left brace#1 1 3#right brace# defects grow and dissolve while the defect band shrinks preferentially on the surface side. At the same time, extraction of boron transient enhanced diffusion (TED) as a function of depth shows a decrease of the supersaturation towards the surface, starting at the location of the defect band. The study clearly shows that in these systems the silicon surface is the principal sink for interstitials. The results provide a critical test of the ability of physical models to ...
2004-02-01
#beta#-decay half-lives of very neutron-rich isotopes of elements from Ti to Ni
International Nuclear Information System (INIS)
The unknown #beta#-decay half-lives of 22 isotopes far off stability (5 < T_Z < 10) in the region from Ti to Ni were measured at GSI, Darmstadt. The nuclei were produced in a fragmentation reaction of 500 A.MeV "8"6Kr-projectile impinging on a thick Be target. The isotopes of interest were separated and identified with the fragment separator, FRS, by a combination of B#rho#,Z, and ToF techniques. An additional range separation was performed by a selective implantation into granular detectors. The spatial and time correlations of the implant with the consecutively detected #beta#-particles were used to determine the unknown half-lives. For nuclei far off stability, #beta#-decay chains were measured and analyzed as well, leading to an even more reliable evaluation of the lifetimes. The large discrepancies found between the measured and the theoretical values emphasize that most recent theoretical work is not an improvement over calculations ...
Study of the influence of surface carbon on the tribological properties of ion-treated steels
Energy Technology Data Exchange (ETDEWEB)
Samples of 100Cr6 steel were treated by different ion beams in order to study the evolution of their tribological properties. A strong correlation was found between the amount of surface carbon, whatever its origin (contamination, direct C implantation or ion-beam mixing of a deposited carbon layer), and the reduction of the friction coefficient as well as the improvement of the wear resistance. These results are discussed in the framework of a recent statistical model founded on the asperity concept and describing the tribological behaviour of bilayer systems.
1999-01-02
Problems involved in developing an index of harm
International Nuclear Information System (INIS)
Death as a criterion (age distribution of occupational death; mean loss of life years due to radiation deaths); accidents at work (incidence of accidents of certain degrees of severity); total loss of working days due to accidents; occupational diseases; somatic and genetic radiation effects; radiation effects during pregnancy (incidence of pregnancies, ristes before implantation, hazards to the embryo, hazards to the foetus, total additional risk due to radiation exposure during pregnancy); age and sex dependence of risk figures; attempted formulation of an index of harm. (HP/orig.).
1979-01-01
On the hydrogen etching mechanism in plasma nitriding of metals
International Nuclear Information System (INIS)
Iron alloys and aluminum were nitrogen implanted in a controlled oxygen atmosphere and the role of hydrogen on the surface etching mechanisms studied. The surface composition was analyzed by in situ photoemission electron spectroscopy (XPS). In iron alloys, hydrogen strongly etches oxygen, improving nitrogen retention on the surface. On the other hand, hydrogen removes nitrogen from aluminum surfaces, with a deleterious effect on the nitriding effectiveness. The oxygen removal in iron alloys is associated with the catalytic effect of electrons in d-orbitals and the nitrogen removal in aluminum is associated with a steric effect.
2006-12-15
Modeling of extended defects in silicon
Energy Technology Data Exchange (ETDEWEB)
Transient Enhanced Diffusion (TED) is one of the biggest modeling challenges present in predicting scaled technologies. Damage from implantation of dopant ions changes the diffusivities of the dopants and precipitates to form complex extended defects. Developing a quantitative model for the extended defect behavior during short time, low temperature anneals is a key to explaining TED. This paper reviews some of the modeling developments over the last several years, and discusses some of the challenges that remain to be addressed. Two examples of models compared to experimental work are presented and discussed.
1997-11-01
Experimental models for testing respiratory tract carcinogens
Energy Technology Data Exchange (ETDEWEB)
The usefulness of the mouse, rat, and Syrian golden hamster as experimental models for studies of the development of respiratory tract cancer is considered. Three different application methods for examining the effects of environmental chemicals on the respiratory tract in these species are discussed: implantation, intratracheal instillation, and inhalation. The results of various investigations are presented to demonstrate that each particular method has both advantages and disadvantages. The techniques are also considered in comparison with the human situation and in the light of obtaining the most valid data for extrapolation to man. Brief attention is paid to the relevance to respiratory tract carcinogenesis of more recently developed organ and cell culture systems.
1982-01-01
Dentascan CT of mandibular incisive canal. Radiological anatomy and therapeutic implications
International Nuclear Information System (INIS)
The main purpose of this paper is to stress the importance of CT depiction of the mandibular incisive canal. This anatomical structure contains a major neurovascular bundle and is thus very important in the planning of mandibular implants in the canine-incisive area. The importance of careful assessment of the mandibular canal course before implantology is now widely recognized. The same holds true for the canine-incisive region in the jaw, to detect the incisive canal if present and prevent any complications from its accidental damage. CT with a dedicated software showed the incisive canal in a large number of patients, which calls for precise reporting of its presence, course, and relationships with teeth.
1999-11-01
The effect of 50 Hz and 60 Hz (frequencies of current distribution) and 20 kHz to 50 kHz (frequencies of induction cooktop) magnetic interference on implanted pacemakers have been assessed with the present generation of device technology. Sixty patients implanted in 1998 and 1999 with dual chamber pacemakers from 9 different manufacturers were monitored with telemetry while passing through, and standing between a system of two coils. They generated a 50 Hz or a 60 Hz magnetic field at 50 microT. Then, patients used a cooktop at different power. The recordings were made with the standard setting of "medically correct" sensing parameters chosen for the patients. Then pacemakers were reprogrammed to the unipolar mode, with the highest atrial (A) and ventricular (V) sensitivity that did not induce muscular inhibition while moving. Between each exposure (50 Hz, 60 Hz or 20 kHz to 50 kHz), the pacemaker programmation was controlled. At the end of the ...
2003-04-01
Physics and quality assurance of low dose rate brachytherapy
International Nuclear Information System (INIS)
Purpose: The purpose of this course is to review the physical principles underlying design, clinical application and execution of interstitial and intracavitary implants in the classical low dose-rate (LDR) range. This year, the course will focus on quality assurance of sources, applicators and treatment planning software. In addition, development of procedures and QA checks designed optimize treatment delivery accuracy and patient safety during each individual procedure will be reviewed. The level of presentation will be designed to accommodate both physicists and physicians. Implementation of recently published AAPM Task Group reports (no. 40, 'Comprehensive Quality Assurance' and No. 43, 'Dosimetry of Interstitial Brachytherapy Sources') will be reviewed. Outline: (A) General Principles (1) QA endpoints: temporal accuracy, positional accuracy, dose delivery accuracy, and safety of the patient, personnel, and the institution (2) QA procedure development: forms, ...
International Nuclear Information System (INIS)
Homologous and heterologous arterial segments were implanted in Fisher rats subcutaneously for the purpose of examining the antibody titer of the recipients' serum after implantation by means of the immune-adherence hemagglutination method. The antibody titer after implantation both of homologous and heterologous grafts decreased to 1/8 by 2.0 million (M) rads irradiation of high voltage cathode rays. The results suggested that high voltage cathode ray irradiation was not enough for heterologous graft to suppress its tissue reaction. Homografts taken from dogs 3 or 6 hours after sacrifice were irradiated with 2.0 M rads and transplanted in canine carotid artery using the technic of end-to-end anastomosis. Angiograms 6 months after operation revealed excellent patency rate in all the grafts of 28 dogs. furthermore, findings of the grafts from 1 week to 5 years after operation on scanning and transmission electron ...
1982-01-01
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